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Sample records for metrology measurement capabilities

  1. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Dr. Glen E. Gronniger

    2007-10-02

    This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 13.2, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2005, and ANSI/NCSL Z540-1. FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/Standards/scopes/2001080.pdf. These parameters are summarized. The Honeywell Federal Manufacturing & Technologies (FM&T) Metrology Department has developed measurement technology and calibration capability in four major fields of measurement: (1) Mechanical; (2) Environmental, Gas, Liquid; (3) Electrical (DC, AC, RF/Microwave); and (4) Optical and Radiation. Metrology Engineering provides the expertise to develop measurement capabilities for virtually any type of measurement in the fields listed above. A strong audit function has been developed to provide a means to evaluate the calibration programs of our suppliers and internal calibration organizations. Evaluation includes measurement audits and technical surveys.

  2. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Barnes, L.M.

    2003-11-12

    This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 8.4, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2000, and ANSI/NCSL Z540-1 (equivalent to ISO Guide 25). FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/ts/htdocs/210/214/scopes/2001080.pdf. These parameters are summarized in the table at the bottom of this introduction.

  3. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Barnes, L.M.

    2000-03-23

    This document contains descriptions of Federal Manufacturing and Technologies (FM and T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties in laboratories that conform to the requirements of the Department of Energy Development and Production Manual Chapter 8.4, and ANSI/NCSL Z540-1 (equivalent to ISO Guide 25). FM and T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. These parameters are summarized.

  4. Capability Handbook- offline metrology

    DEFF Research Database (Denmark)

    Islam, Aminul; Marhöfer, David Maximilian; Tosello, Guido

    This offline metrological capability handbook has been made in relation to HiMicro Task 3.3. The purpose of this document is to assess the metrological capability of the HiMicro partners and to gather the information of all available metrological instruments in the one single document. It provides...... a quick overview of what is possible today by the state of the art, what the HiMicro consortium can do and what metrological requirements we have concerning the HiMicro industrial demonstrators....

  5. Precision Metrology Using Weak Measurements

    Science.gov (United States)

    Zhang, Lijian; Datta, Animesh; Walmsley, Ian A.

    2015-05-01

    Weak values and measurements have been proposed as a means to achieve dramatic enhancements in metrology based on the greatly increased range of possible measurement outcomes. Unfortunately, the very large values of measurement outcomes occur with highly suppressed probabilities. This raises three vital questions in weak-measurement-based metrology. Namely, (Q1) Does postselection enhance the measurement precision? (Q2) Does weak measurement offer better precision than strong measurement? (Q3) Is it possible to beat the standard quantum limit or to achieve the Heisenberg limit with weak measurement using only classical resources? We analyze these questions for two prototypical, and generic, measurement protocols and show that while the answers to the first two questions are negative for both protocols, the answer to the last is affirmative for measurements with phase-space interactions, and negative for configuration space interactions. Our results, particularly the ability of weak measurements to perform at par with strong measurements in some cases, are instructive for the design of weak-measurement-based protocols for quantum metrology.

  6. Precision metrology using weak measurements.

    Science.gov (United States)

    Zhang, Lijian; Datta, Animesh; Walmsley, Ian A

    2015-05-29

    Weak values and measurements have been proposed as a means to achieve dramatic enhancements in metrology based on the greatly increased range of possible measurement outcomes. Unfortunately, the very large values of measurement outcomes occur with highly suppressed probabilities. This raises three vital questions in weak-measurement-based metrology. Namely, (Q1) Does postselection enhance the measurement precision? (Q2) Does weak measurement offer better precision than strong measurement? (Q3) Is it possible to beat the standard quantum limit or to achieve the Heisenberg limit with weak measurement using only classical resources? We analyze these questions for two prototypical, and generic, measurement protocols and show that while the answers to the first two questions are negative for both protocols, the answer to the last is affirmative for measurements with phase-space interactions, and negative for configuration space interactions. Our results, particularly the ability of weak measurements to perform at par with strong measurements in some cases, are instructive for the design of weak-measurement-based protocols for quantum metrology.

  7. Metrology and measurement

    CERN Document Server

    Bewoor, Anand K

    2009-01-01

    Meant for students and practicing engineers, this book provides an integrated exposure to dimensional and mechanical measurement. It gives the reader a methodical and well thought-out presentation using concise explanations, flexible approach and real-life case studies from the industry.

  8. Metrology Careers: Jobs for Good Measure

    Science.gov (United States)

    Liming, Drew

    2009-01-01

    What kind of career rewards precision and accuracy? One in metrology--the science of measurement. By evaluating and calibrating the technology in people's everyday lives, metrologists keep their world running smoothly. Metrology is used in the design and production of almost everything people encounter daily, from the cell phones in their pockets…

  9. The quality of measurements a metrological reference

    CERN Document Server

    Fridman, A E

    2012-01-01

    This book provides a detailed discussion and commentary on the fundamentals of metrology. The fundamentals of metrology, the principles underlying the design of the SI International System of units, the theory of measurement error, a new methodology for estimation of measurement accuracy based on uncertainty, and methods for reduction of measured results and estimation of measurement uncertainty are all discussed from a modern point of view. The concept of uncertainty is shown to be consistent with the classical theory of accuracy. The theory of random measurement errors is supplemented by a very general description based on the generalized normal distribution; systematic instrumental error is described in terms of a methodology for normalizing the metrological characteristics of measuring instruments. A new international system for assuring uniformity of measurements based on agreements between national metrological institutes is discussed, in addition to the role and procedure for performance of key compari...

  10. Quantum metrology foundation of units and measurements

    CERN Document Server

    Goebel, Ernst O

    2015-01-01

    The International System of Units (SI) is the world's most widely used system of measurement, used every day in commerce and science, and is the modern form of the metric system. It currently comprises the meter (m), the kilogram (kg), the second (s), the ampere (A), the kelvin (K), the candela (cd) and the mole (mol)). The system is changing though, units and unit definitions are modified through international agreements as the technology of measurement progresses, and as the precision of measurements improves. The SI is now being redefined based on constants of nature and their realization by quantum standards. Therefore, the underlying physics and technologies will receive increasing interest, and not only in the metrology community but in all fields of science. This book introduces and explains the applications of modern physics concepts to metrology, the science and the applications of measurements. A special focus is made on the use of quantum standards for the realization of the forthcoming new SI (the...

  11. Metrology of vibration measurements by laser techniques

    Science.gov (United States)

    von Martens, Hans-Jürgen

    2008-06-01

    Metrology as the art of careful measurement has been understood as uniform methodology for measurements in natural sciences, covering methods for the consistent assessment of experimental data and a corpus of rules regulating application in technology and in trade and industry. The knowledge, methods and tools available for precision measurements can be exploited for measurements at any level of uncertainty in any field of science and technology. A metrological approach to the preparation, execution and evaluation (including expression of uncertainty) of measurements of translational and rotational motion quantities using laser interferometer methods and techniques will be presented. The realization and dissemination of the SI units of motion quantities (vibration and shock) have been based on laser interferometer methods specified in international documentary standards. New and upgraded ISO standards are reviewed with respect to their suitability for ensuring traceable vibration measurements and calibrations in an extended frequency range of 0.4 Hz to higher than 100 kHz. Using adequate vibration exciters to generate sufficient displacement or velocity amplitudes, the upper frequency limits of the laser interferometer methods specified in ISO 16063-11 for frequencies procedures (i.e. measurement uncertainty 0.05 % at frequencies <= 10 kHz, <= 1 % up to 100 kHz).

  12. INCREASING METROLOGICAL AUTONOMY OF IN-PLANT MEASURING SYSTEMS

    Directory of Open Access Journals (Sweden)

    Mykola Mykyychuk

    2016-12-01

    Full Text Available The authors offer to solve the problem of providing traceability of measurements by increasing metrological autonomy of in-plant measuring systems. The paper shows the expedience of increasing metrological autonomy by creating a "virtual" reference. There are analysed possible variants of implementation of the "virtual" reference, which will provide high metrological stability of measurements at insignificant additional expenses. The authors point out the necessity of creation of universal technical and programmatic means of mutual comparison for the in-plant measuring systems to increase the reliability of measurements in the conditions of metrological autonomy.

  13. Coordinate metrology accuracy of systems and measurements

    CERN Document Server

    Sładek, Jerzy A

    2016-01-01

    This book focuses on effective methods for assessing the accuracy of both coordinate measuring systems and coordinate measurements. It mainly reports on original research work conducted by Sladek’s team at Cracow University of Technology’s Laboratory of Coordinate Metrology. The book describes the implementation of different methods, including artificial neural networks, the Matrix Method, the Monte Carlo method and the virtual CMM (Coordinate Measuring Machine), and demonstrates how these methods can be effectively used in practice to gauge the accuracy of coordinate measurements. Moreover, the book includes an introduction to the theory of measurement uncertainty and to key techniques for assessing measurement accuracy. All methods and tools are presented in detail, using suitable mathematical formulations and illustrated with numerous examples. The book fills an important gap in the literature, providing readers with an advanced text on a topic that has been rapidly developing in recent years. The book...

  14. Quantum metrology in coarsened measurement reference

    Science.gov (United States)

    Xie, Dong; Xu, Chunling; Wang, An Min

    2017-01-01

    We investigate the role of coarsened measurement reference, which originates from the coarsened reference time and basis, in quantum metrology. When the measurement is based on one common reference basis, the disadvantage of coarsened measurement can be removed by symmetry. Owing to the coarsened reference basis, the entangled state cannot perform better than the product state for a large number of probe particles in estimating the phase. Given a finite uncertainty of the coarsened reference basis, the optimal number of probe particles is obtained. Finally, we prove that the maximally entangled state always achieves better frequency precision in the case of non-Markovian dephasing than that in the case of Markovian dephasing. The product state is more resistant to the interference of the coarsened reference time than the entangled state.

  15. Optical metrology techniques for dimensional stability measurements

    NARCIS (Netherlands)

    Ellis, Jonathan David

    2010-01-01

    This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

  16. Optical metrology techniques for dimensional stability measurements

    NARCIS (Netherlands)

    Ellis, Jonathan David

    2010-01-01

    This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

  17. Large format focal plane array integration with precision alignment, metrology and accuracy capabilities

    Science.gov (United States)

    Neumann, Jay; Parlato, Russell; Tracy, Gregory; Randolph, Max

    2015-09-01

    Focal plane alignment for large format arrays and faster optical systems require enhanced precision methodology and stability over temperature. The increase in focal plane array size continues to drive the alignment capability. Depending on the optical system, the focal plane flatness of less than 25μm (.001") is required over transition temperatures from ambient to cooled operating temperatures. The focal plane flatness requirement must also be maintained in airborne or launch vibration environments. This paper addresses the challenge of the detector integration into the focal plane module and housing assemblies, the methodology to reduce error terms during integration and the evaluation of thermal effects. The driving factors influencing the alignment accuracy include: datum transfers, material effects over temperature, alignment stability over test, adjustment precision and traceability to NIST standard. The FPA module design and alignment methodology reduces the error terms by minimizing the measurement transfers to the housing. In the design, the proper material selection requires matched coefficient of expansion materials minimizes both the physical shift over temperature as well as lowering the stress induced into the detector. When required, the co-registration of focal planes and filters can achieve submicron relative positioning by applying precision equipment, interferometry and piezoelectric positioning stages. All measurements and characterizations maintain traceability to NIST standards. The metrology characterizes the equipment's accuracy, repeatability and precision of the measurements.

  18. Why should we apply more metrological knowledge to field measurements?

    Science.gov (United States)

    Buchholz, B.; Kraemer, M.; Rolf, C.; Wagner, S.; Zondlo, M. A.; Ebert, V.

    2016-12-01

    Metrology, the science of measurement, defines the SI, the international system of measurement units, their realization and aims to provide a traceable linkage of measurements to the SI. Primary standards at the national metrology institutes (NMIs) provide the highest achievable accuracy levels linked to the SI and thus are ideal scale reference points to establish long-term comparability between instruments in large networks e.g. in global atmospheric monitoring. However, NMIs offer much more than traceable standards. Metrological communities share internally a large valuable knowledge about "how to measure", e.g. how to calculate, assess and estimate impacts which deteriorate measurements or how to minimize negative impacts and address them in a systematic way with a scientific approach. Over the last years WMO, the world meteorological organization, as well as sub communities in the environmental sciences (e.g. the TCCON or GRUAN network), have greatly increased their efforts to integrate metrological principles and improved the comparability across the network. Prominent examples are airborne water vapor measurements, which, despite the well validated global metrological water scale for industry applications, are only very rarely linked to it, mainly due to the lack of established transfer standards. During the last years our group at PTB developed a new class of optical hygrometers and related validation strategies, in order to reduce deviations of up to 20% found in AquaVIT, a large scale, lab based comparison of leading airborne field hygrometers (Fahey et al, AMT, 7, 3159-3251, 2014) down to a long-term stability over 18 month of 0.35%, making this instrument (SEALDH-II) the first dTDLAS-based airborne transfer standards for atmospheric humidity. These and other examples lead to the conclusion that scientific communities starting to enroll metrological principles significantly improve their measurements and eventually the validity as well as interpretation

  19. Real cell overlay measurement through design based metrology

    Science.gov (United States)

    Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Jo, Gyoyeon; Yang, Hyunjo; Yim, Donggyu; Yamamoto, Masahiro; Maruyama, Kotaro; Park, Byungjun

    2014-04-01

    Until recent device nodes, lithography has been struggling to improve its resolution limit. Even though next generation lithography technology is now facing various difficulties, several innovative resolution enhancement technologies, based on 193nm wavelength, were introduced and implemented to keep the trend of device scaling. Scanner makers keep developing state-of-the-art exposure system which guarantees higher productivity and meets a more aggressive overlay specification. "The scaling reduction of the overlay error has been a simple matter of the capability of exposure tools. However, it is clear that the scanner contributions may no longer be the majority component in total overlay performance. The ability to control correctable overlay components is paramount to achieve the desired performance.(2)" In a manufacturing fab, the overlay error, determined by a conventional overlay measurement: by using an overlay mark based on IBO and DBO, often does not represent the physical placement error in the cell area of a memory device. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion, caused by etching or CMP, also can be a source of the mismatch. Therefore, the requirement of a direct overlay measurement in the cell pattern gradually increases in the manufacturing field, and also in the development level. In order to overcome the mismatch between conventional overlay measurement and the real placement error of layer to layer in the cell area of a memory device, we suggest an alternative overlay measurement method utilizing by design, based metrology tool. A basic concept of this method is shown in figure1. A CD-SEM measurement of the overlay error between layer 1 and 2 could be the ideal method but it takes too long time to extract a lot of data from wafer level. An E-beam based DBM tool provides high speed to cover the whole wafer with high repeatability. It is enabled by using the design as a

  20. Metrology Measurements of the DSTO Transonic Wind Tunnel Store Support Arm

    Science.gov (United States)

    2013-12-01

    UNCLASSIFIED UNCLASSIFIED Metrology Measurements of the DSTO Transonic Wind Tunnel Store Support Arm Adam Blandford, John Clayton...provide quality assurance for test clients. This document details metrology measurements that were conducted during February and March 2013 on the store...Australia 2013 AR-015-818 December 2013 APPROVED FOR PUBLIC RELEASE UNCLASSIFIED UNCLASSIFIED Metrology Measurements of the DSTO

  1. Dynamic Length Metrology (DLM) for measurements with sub-micrometre uncertainty in a production environment

    DEFF Research Database (Denmark)

    De Chiffre, Leonardo; Hansen, Hans Nørgaard; Hattel, Jesper Henri

    2016-01-01

    Conventional length metrology for traceable accurate measurements requires costly temperature controlled facilities, long waiting time for part acclimatisation, and separate part material characterisation. This work describes a method called Dynamic Length Metrology (DLM) developed to achieve sub...

  2. In-plane displacement measurement in vortex metrology by synthetic network correlation fringes.

    Science.gov (United States)

    Angel-Toro, Luciano; Sierra-Sosa, Daniel; Tebaldi, Myrian; Bolognini, Néstor

    2013-03-01

    Recently we proposed an alternative method of displacement analysis in vortex metrology, based on the application of the Fourier optics techniques, that is suitable for an intermediate range of displacement measurements ranging below the resolution of speckle photography and above that of the conventional vortex metrology. However, for smaller displacements, we introduce an approach to perform the Fourier analysis from vortex networks. In this work, we present an enhanced method for measuring uniform in-plane displacements, taking advantage of the capability of determining the subpixel locations of vortices and having the ability to track the homologous vortices onto a plane. It is shown that high-quality fringe systems can be synthesized and analyzed to accurately measure in an extended range of displacements and for highly decorrelated speckle patterns. Experimental results supporting the validity of the method are presented and discussed.

  3. Ultracold Molecules in Lattices for Metrology and Precision Measurements

    Science.gov (United States)

    Reinaudi, Gael; Osborn, Chris; McDonald, Mickey; Wang, Dili; Zelevinsky, Tanya

    2012-06-01

    Ultracold diatomic molecules offer exciting possibilities for studies of novel states of matter, quantum information, and metrology. Two-electron-atom based molecules are particularly promising for precision measurements, such as molecular time metrology and variations of the proton-electron mass ratio. We present an experimental setup that allows for the photoassociation, in an optical lattice, of strontium atoms into molecules using the narrow singlet-triplet transitions. We feature newly observed two-photon photoassociation to deeply bound molecular levels, as well as the study of the lifetime of such molecules in lattices, which is a determining factor concerning the practical use of this system. Other characteristics of our setup are presented, such as a computer controlled permanent-magnet Zeeman slower optimized with a genetic algorithm.

  4. Single-shot adaptive measurement for quantum-enhanced metrology

    Science.gov (United States)

    Palittpongarnpim, Pantita; Wittek, Peter; Sanders, Barry C.

    2016-09-01

    Quantum-enhanced metrology aims to estimate an unknown parameter such that the precision scales better than the shot-noise bound. Single-shot adaptive quantum-enhanced metrology (AQEM) is a promising approach that uses feedback to tweak the quantum process according to previous measurement outcomes. Techniques and formalism for the adaptive case are quite different from the usual non-adaptive quantum metrology approach due to the causal relationship between measurements and outcomes. We construct a formal framework for AQEM by modeling the procedure as a decision-making process, and we derive the imprecision and the Craḿer- Rao lower bound with explicit dependence on the feedback policy. We also explain the reinforcement learning approach for generating quantum control policies, which is adopted due to the optimal policy being non-trivial to devise. Applying a learning algorithm based on differential evolution enables us to attain imprecision for adaptive interferometric phase estimation, which turns out to be SQL when non-entangled particles are used in the scheme.

  5. Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

    Energy Technology Data Exchange (ETDEWEB)

    Alcock, Simon G., E-mail: simon.alcock@diamond.ac.uk; Nistea, Ioana; Sawhney, Kawal [Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE (United Kingdom)

    2016-05-15

    We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

  6. Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad.

    Science.gov (United States)

    Alcock, Simon G; Nistea, Ioana; Sawhney, Kawal

    2016-05-01

    We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM's autocollimator adds into the overall measured value of the mirror's slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

  7. Metrology of human-based and other qualitative measurements

    Science.gov (United States)

    Pendrill, Leslie; Petersson, Niclas

    2016-09-01

    The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component

  8. Spectroscopic metrology for isotope composition measurements and transfer standards

    Science.gov (United States)

    Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

    2017-04-01

    The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H

  9. Laser metrology in fluid mechanics granulometry, temperature and concentration measurements

    CERN Document Server

    Boutier, Alain

    2013-01-01

    In fluid mechanics, non-intrusive measurements are fundamental in order to improve knowledge of the behavior and main physical phenomena of flows in order to further validate codes.The principles and characteristics of the different techniques available in laser metrology are described in detail in this book.Velocity, temperature and concentration measurements by spectroscopic techniques based on light scattered by molecules are achieved by different techniques: laser-induced fluorescence, coherent anti-Stokes Raman scattering using lasers and parametric sources, and absorption sp

  10. Metrology measurements for large-aperture VPH gratings

    Science.gov (United States)

    Zheng, Jessica R.; Gers, Luke; Heijmans, Jeroen

    2013-09-01

    The High Efficiency and Resolution Multi Element Spectrograph (HERMES) for the Australian Astronomical Observatory (AAO) uses four large aperture, high angle of incidence volume phase holographic gratings (VPHG) for high resolution `Galactic archaeology' spectroscopy. The large clear aperture, the high diffraction efficiency, the line frequency homogeneity, and mosaic alignment made manufacturing and testing challenging. We developed new metrology systems at the AAO to verify the performance of these VPH gratings. The measured diffraction efficiencies and line frequency of the VPH gratings received so far meet the vendor's provided data. The wavefront quality for the Blue VPH grating is good but the Green and Red VPH gratings need to be post polishing.

  11. EPHIN anisotropy measurement capability

    Science.gov (United States)

    Banjac, S.; Gómez-Herrero, R.; Heber, B.; Kühl, P.; Terasa, C.

    2015-08-01

    The EPHIN instrument (Electron Proton Helium INstrument) forms a part of the COSTEP experiment (COmprehensive SupraThermal and Energetic Particle Analyzer) within the CEPAC collaboration on board of the SOHO spacecraft (SOlar and Heliospheric Observatory). The EPHIN sensor is a stack of six solid-state detectors surrounded by an anticoincidence. It measures energy spectra of electrons in the range 250 keV to > 8.7 MeV, and hydrogen and helium isotopes in the range 4 MeV/nuc to > 53 MeV/nuc. In order to improve the isotopic resolution, the first two detectors have been segmented: 5 sectors form a ring enclosing a central segment. This does not only allow to correct the energy-losses for particles with different path-lengths in the detectors, but allows also an estimation of the arrival direction with respect to the sensor axis. For that purpose we developed a method that allows for inferring the angle of incidence and angular distribution for ions. Here we describe the method and apply it to the November, 3, 2011 event. Due to the lack of magnetic field measurements and the restricted view cone of 83°, it is not possible to derive a real pitch angle distribution during this event. However, we can show that the particle distribution is anisotropic for several hours with a symmetry axis that deviates by about 20° from the sensor axis.

  12. Management of metrology in measuring of the displacement of building construction

    Directory of Open Access Journals (Sweden)

    Jiří Kratochvíl

    2007-06-01

    Full Text Available The metrology management of the measurement of the displacement of building construction is not regulated in the standard ČSN ISO 73 0405 - Measurement of the displacement of building construction. But the metrology management has to be included in the project of measurement of the displacement (Stage of project. Then we have to pay an attention to the metrological management during this measurement (Stage of realization and during the evaluation of this measurement (Stage of evaluation. We have to insist on the subsequent improving of metrology management within the frame of the next project (so-called feedback. The metrology management in the measurement of the displacement during the stages should be based on an application of statutory instruments and technical standards. We should insist especially on the system of standards for the quality control ISO 9000. Considering specialities of geodetic measurements it is necessary to adapt the metrology management. That is why it will differ from the metrology management in other fields of knowledge. This paper includes some steps of metrological provision which must not be ignored.

  13. Metrology Arrangement for Measuring the Positions of Mirrors of a Submillimeter Telescope

    Science.gov (United States)

    Abramovici, Alex; Bartman, Randall K.

    2011-01-01

    The position of the secondary mirror of a submillimeter telescope with respect to the primary mirror needs to be known .0.03 mm in three dimensions. At the time of this reporting, no convenient, reasonably priced arrangement that offers this capability exists. The solution proposed here relies on measurement devices developed and deployed for the GeoSAR mission, and later adapted for the ISAT (Innovative Space Based Radar Antenna Technology) demonstration. The measurement arrangement consists of four metrology heads, located on an optical bench, attached to the secondary mirror. Each metrology head has a dedicated target located at the edge of the primary mirror. One laser beam, launched from the head and returned by the target, is used to measure distance. Another beam, launched from a beacon on the target, is monitored by the metrology head and generates a measurement of the target position in the plane perpendicular to the laser beam. A 100-MHz modulation is carried by a collimated laser beam. The relevant wavelength is the RF one, 3 m, divided by two, because the light carries it to the target and back. The phase change due to travel to the target and back is measured by timing the zero-crossing of the RF modulation, using a 100-MHz clock. In order to obtain good resolution, the 100-MHz modulation signal is down-converted to 1 kHz. Then, the phase change corresponding to the round-trip to the target is carried by a 1-kHz signal. Since the 100-MHz clock beats 100,000 times during one period of the 1-kHz signal, the least-significant-bit (LSB) resolution is LSB = 0.015 mm.

  14. Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

    Science.gov (United States)

    Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

    2004-05-01

    Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will

  15. Report on non-destructive traceable measuring technologies for micro systems metrology

    DEFF Research Database (Denmark)

    Gasparin, Stefania; Tosello, Guido; Hansen, Hans Nørgaard

    2010-01-01

    The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field...

  16. Metrological Characterisation of a Fast Digital Integrator for Magnetic Measurements at CERN

    CERN Document Server

    Arpaia, P; Masi, A; Spiezia, G

    2007-01-01

    A Fast Digital Integrator (FDI) was designed to satisfy new more demanding requirements of dynamic accuracy and trigger frequency in magnetic measurements based on rotating coil systems for analyzing superconducting magnets in particle accelerators. In particular, in flux measurement, a bandwidth up to 50-100 kHz and a dynamic accuracy of 10 ppm are targeted. In this paper, results of static and dynamic metrological characterization of the FDI prototype and of the Portable Digital Integrator (PDI), heavely used at CERN and in many sub-nuclear laboratories, are compared. Preliminary results show how the initial prototype of FDI is already capable of both overcoming dynamic performance of PDI and covering operating regions inaccessible before.

  17. Relativistic Quantum Metrology: Exploiting relativity to improve quantum measurement technologies

    CERN Document Server

    Ahmadi, Mehdi; Friis, Nicolai; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

    2013-01-01

    We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory (QFT). QFT properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in QFT including proper times and acce...

  18. Report on non-destructive traceable measuring technologies for micro systems metrology

    DEFF Research Database (Denmark)

    Gasparin, Stefania; Tosello, Guido; Hansen, Hans Nørgaard

    2010-01-01

    The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field......The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field...

  19. [Recommendations for metrological control of measuring equipments in the clinical laboratories].

    Science.gov (United States)

    Dumontet, M; Giroud, C; Vassault, A; Guitel, F; Perrin, A; Braconnier, F; Férard, G; Beaudeux, J-L

    2009-01-01

    The control of the measuring equipment (balances, mass standards, micropipettes, dilutors, volumetric glassware, thermometers...) is essential to obtain reliable analytical results. This control requires knowledge and use of the main standards, instructions for use, metrological verifications and confirmations as well as creation of checking and standardizing certificates ensuring metrological traceability. These items should help to control the quality of the analytical performances (fidelity and trueness in particular).

  20. Primary Laboratory for Dimentional Metrology Annual Report 2000

    DEFF Research Database (Denmark)

    De Chiffre, Leonardo; Rasmussen, Svend Nytoft

    2001-01-01

    The measurement capability concerning different areas within geometrical metrology has been maintained through approximately 1700 calibration and testing tasks for Danish clients.......The measurement capability concerning different areas within geometrical metrology has been maintained through approximately 1700 calibration and testing tasks for Danish clients....

  1. Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

    Science.gov (United States)

    Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

    2014-05-22

    We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

  2. Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

    Science.gov (United States)

    Pendrill, L. R.; Fisher, William P., Jr.

    2013-09-01

    A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity.

  3. A metrological approach to improve accuracy and reliability of ammonia measurements in ambient air

    Science.gov (United States)

    Pogány, Andrea; Balslev-Harder, David; Braban, Christine F.; Cassidy, Nathan; Ebert, Volker; Ferracci, Valerio; Hieta, Tuomas; Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Peltola, Jari; Persijn, Stefan; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

    2016-11-01

    The environmental impacts of ammonia (NH3) in ambient air have become more evident in the recent decades, leading to intensifying research in this field. A number of novel analytical techniques and monitoring instruments have been developed, and the quality and availability of reference gas mixtures used for the calibration of measuring instruments has also increased significantly. However, recent inter-comparison measurements show significant discrepancies, indicating that the majority of the newly developed devices and reference materials require further thorough validation. There is a clear need for more intensive metrological research focusing on quality assurance, intercomparability and validations. MetNH3 (Metrology for ammonia in ambient air) is a three-year project within the framework of the European Metrology Research Programme (EMRP), which aims to bring metrological traceability to ambient ammonia measurements in the 0.5-500 nmol mol-1 amount fraction range. This is addressed by working in three areas: (1) improving accuracy and stability of static and dynamic reference gas mixtures, (2) developing an optical transfer standard and (3) establishing the link between high-accuracy metrological standards and field measurements. In this article we describe the concept, aims and first results of the project.

  4. 3D-SEM Metrology for Coordinate Measurements at the Nanometer Scale

    DEFF Research Database (Denmark)

    Carli, Lorenzo

    The present work deals with a study concerning 3D-SEM metrology as a tool for coordinate measurements at the nanometer scale. The relevance of 3D-SEM, based on stereophotogrammetry technique, has been highlighted with respect to the other measuring instruments nowadays available and the main issues...... to be addressed concerning uncertainty evaluation have been discussed. Most recent developments in the field of micro and nano-metrology, in terms of measuring machines and techniques, are described pointing out advantages and limitations. The importance of multi-sensor and multi-orientation strategy...... to 3D reconstructions, are given and the main phases involved in stereophotogrammetry technique are described underlying the most relevant error sources in the case of 2D and 3D-SEM metrology. An uncertainty evaluation has been thus carried out in accordance with ISO GUM, following a holistic approach...

  5. Estimation of measurement uncertainties in X-ray computed tomography metrology using the substitution method

    DEFF Research Database (Denmark)

    Müller, Pavel; Hiller, Jochen; Dai, Y.

    2014-01-01

    This paper presents the application of the substitution method for the estimation of measurement uncertainties using calibrated workpieces in X-ray computed tomography (CT) metrology. We have shown that this, well accepted method for uncertainty estimation using tactile coordinate measuring...

  6. Phame: a novel phase metrology tool of Carl Zeiss for in-die phase measurements under scanner relevant optical settings

    Science.gov (United States)

    Perlitz, Sascha; Buttgereit, Ute; Scherübl, Thomas

    2007-03-01

    Meeting the demands of the lithography mask manufacturing industry moving toward 45nm and 32nm node for in-die phase metrology on phase shifting masks, Zeiss is currently developing an optical phase measurement tool (Phame TM), providing the capability of extending process control from large CD test features to in-die phase shifting features with high spatial resolution. In collaboration with Intel, the necessity of designing this optical metrology tool according to the optical setup of a lithographic exposure tool (scanner) has been researched to be fundamental for the acquisition of phase information generated from features the size of the used wavelength. Main cause is the dependence of the image phase of a scanner on polarization and the angle of incidence of the illumination light due to rigorous effects, and on the imaging NA of the scanner due to the loss of phase information in the imaging pupil. The resulting scanner phase in the image plane only coincides with the etch-depth equivalent phase for large test features, exceeding the size of the in-die feature by an order of magnitude. In this paper we introduce the Phame TM phase metrology tool, using a 193nm light source with the optical capability of phase measurement at scanner NA up to the equivalent of a NA1.6 immersion scanner, under varying, scanner relevant angle of incidence for EAPSMs and CPLs, and with the possibility of polarizing the illuminating light. New options for phase shifting mask process control on in-die features will be outlined with first measurement results.

  7. Automated metrology and NDE measurements for increased throughput in aerospace component manufacture

    Science.gov (United States)

    MacLeod, Charles N.; Pierce, S. Gareth; Morozov, Maxim; Summan, Rahul; Dobie, Gordon; McCubbin, Paul; McCubbin, Coreen; Dearie, Scott; Munro, Gavin

    2015-03-01

    Composite materials, particularly Carbon-Fibre-Reinforced Polymer (CFRP), find extensive use in construction of modern airframe structures. Quality and conformance checks can be a serious limitation on production throughput in aerospace manufacturing. Traditionally Non-Destructive Evaluation (NDE) and metrology measurements are undertaken at different stages of a product manufacture cycle using specific dedicated equipment and personnel. However, since both processes involve direct interaction with the component's surface, an opportunity exists to combine these to potentially reduce overall cycle time. In addition when considering moves towards automation of both inspection processes, it is clear that measured metrology data is an essential input parameter to the automated NDE workflow. The authors present the findings of a proof of concept combined sub-scale NDE and Metrology demonstrator cell for aerospace components. Permitting a maximum part area size of 3 × 1 m2, KUKA KR5 6 degree of freedom robotic manipulators were utilised to deploy two inspection payloads. Firstly automated non-contact photogrammetric metrology measurement was employed to inspect the structure for conformance of dimension in relation to reference designs (available from CAD). Secondly automated phased array technology was deployed to inspect and produce ultrasonic thickness mapping of components of nominal 20mm thickness. Parameters such as overall cycle time, part dimensional accuracy, robotic path accuracy and data registration are assessed in the paper to highlight both the current state of the art performance available and the future direction of required research focus.

  8. What metrology can do to improve the quality of your atmospheric ammonia measurements

    Science.gov (United States)

    Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

    2017-04-01

    Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements, namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures, as well as in the infrastructure to attain metrological traceability, i.e. that the results of measurements are traceable to SI-units through an unbroken chain of calibrations. In the framework of the European Metrology Research Programme (EMRP) project on the topic "Metrology for Ammonia in Ambient Air" (MetNH3), European national metrology institutes (NMI's) have joined to tackle the issue of generating SI-traceable reference material, i.e. generate reference gas mixtures containing known amount fractions of NH3.This requires special infrastructure and analytical techniques: Measurements of ambient ammonia are commonly carried out with diffusive samplers or by active sampling with denuders, but such techniques have not yet been extensively validated. Improvements in the metrological traceability may be achieved through the determination of NH3 diffusive sampling rates using ammonia Primary Standard Gas Mixtures (PSMs), developed by gravimetry at the National Physical Laboratory NPL and a controlled atmosphere test facility in combination with on-line monitoring with a cavity ring-down spectrometer. The Federal Institute of Metrology METAS has developed an infrastructure to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol (atmospheric concentrations) and with uncertainties UNH3 filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field

  9. Precision metrology.

    Science.gov (United States)

    Jiang, X; Whitehouse, D J

    2012-08-28

    This article is a summary of the Satellite Meeting, which followed on from the Discussion Meeting at the Royal Society on 'Ultra-precision engineering: from physics to manufacture', held at the Kavli Royal Society International Centre, Chicheley Hall, Buckinghamshire, UK. The meeting was restricted to 18 invited experts in various aspects of precision metrology from academics from the UK and Sweden, Government Institutes from the UK and Germany and global aerospace industries. It examined and identified metrology problem areas that are, or may be, limiting future developments in precision engineering and, in particular, metrology. The Satellite Meeting was intended to produce a vision that will inspire academia and industry to address the solutions of those open-ended problems identified. The discussion covered three areas, namely the function of engineering parts, their measurement and their manufacture, as well as their interactions.

  10. DESIGNING AND MEASURING CAPABILITY. A NEW PERSPECTIVE

    Directory of Open Access Journals (Sweden)

    Ovidiu COCENESCU

    2013-01-01

    Full Text Available The concept of capability has long been a topic for debate among planners. The main benefit brought by it is that of ensuring the connection between objectives and necessary financial resources. Thus, capability is a median element within the process of integrated planning. In this context, there are sceptics who consider that capability cannot be measured. However, this article aims at presenting a pattern and a formula for measuring and interpreting the level of capability.

  11. Improving metrology for micro-optics manufacturing

    Science.gov (United States)

    Davies, Angela D.; Bergner, Brent C.; Gardner, Neil W.

    2003-11-01

    Metrology is one of the critical enabling technologies for realizing the full market potential for micro-optical systems. Measurement capabilities are currently far behind present and future needs. Much of today"s test equipment was developed for the micro-electronics industry and is not optimized for micro-optic materials and geometries. Metrology capabilities currently limit the components that can be realized, in many cases. Improved testing will be come increasingly important as the technology moves to integration where it will become important to "test early and test often" to achieve high yields. In this paper, we focus on micro-refractive components in particular, and describe measurement challenges for this class of components and current and future needs. We also describe a new micro-optics metrology research program at UNC Charlotte under the Center for Precision Metrology and the new Center for Optoelectronics and Optical Communications to address these needs.

  12. Metrological challenges for measurements of key climatological observables, Part 4: Atmospheric relative humidity.

    Science.gov (United States)

    Lovell-Smith, J W; Feistel, R; Harvey, A H; Hellmuth, O; Bell, S A; Heinonen, M; Cooper, J R

    Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth's radiation balance, atmospheric water vapour is the strongest "greenhouse" gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. In this paper, we examine the climatologically relevant atmospheric relative humidity, noting fundamental deficiencies in the definition of this key observable. The metrological history of this quantity is reviewed, problems with its current definition and measurement practice are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures, (BIPM), in cooperation with the International Association for the Properties of Water and Steam, IAPWS, along with other international organisations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions for this long standing metrological problem, such as are suggested here.

  13. Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

    Science.gov (United States)

    Fisher, William P., Jr.; Stenner, A. Jackson

    2013-09-01

    The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice.

  14. The Limits of CD Metrology

    Science.gov (United States)

    Rice, Bryan J.; Cao, Heidi; Grumski, Michael; Roberts, Jeanette

    2005-09-01

    One of the many technology decisions facing the semiconductor industry for the 32 nm node (and beyond) is the selection of the best critical dimension (CD) metrology equipment to meet the needs of process equipment suppliers and semiconductor manufacturers. Over the past three years Intel ® has fabricated a variety of test structures and performed a number of technology evaluations aimed at determining the limits of today's CD metrology. In this paper we discuss the capability of those technologies to measure structures having dimensions representative of the 45 nm, 32 nm, and 22 nm nodes.

  15. Metrological and operational performance of measuring systems used in vehicle compressed natural gas filling stations

    Energy Technology Data Exchange (ETDEWEB)

    Velosa, Jhonn F.; Abril, Henry; Garcia, Luis E. [CDT de GAS (Venezuela). Gas Technological Development Center Corporation

    2008-07-01

    Corporation CDT GAS financially supported by the Colombian government through COLCIENCIAS, carried out a study aimed at designing, developing and implementing in Colombia a calibration and metrological verification 'specialized service' for gas meters installed at dispensers of filling stations using compressed natural gas. The results permitted the identification of improving opportunities (in measuring systems, equipment and devices used to deliver natural gas) which are focused on achieving the highest security and reliability of trading processes of CNG for vehicles. In the development of the first stage of the project, metrological type variables were initially considered, but given the importance of the measuring system and its interaction with the various elements involving gas supply to the filling station, the scope of the work done included aspects related to the operational performance, that is, those influencing the security of the users and the metrological performance of the measuring system. The development of the second stage counted on the collaboration of national companies from the sector of CNG for vehicles, which permitted the carrying out of multiple calibrations to the measuring systems installed in the CNG dispensers, thus achieving, in a concrete way, valid and reliable technological information of the implemented procedures. (author)

  16. Importance of education and competence maintenance in metrology field (measurement science)

    Science.gov (United States)

    Dobiliene, J.; Meskuotiene, A.

    2015-02-01

    For certain tasks in metrology field trained employers might be necessary to fulfill specific requirements. It is important to pay attention that metrologists are responsible for fluent work of devices that belong to huge variety of vide spectrum of measurements. People who perform measurements (that are related to our safety, security or everyday life) with reliable measuring instruments must be sure for trueness of their results or conclusions. So with the purpose to reach the harmony between the ordinary man and his used means it is very important to ensure competence of specialists that are responsible for mentioned harmony implementation. Usually these specialists have a university degree and perform highly specified tasks in science, industry or laboratories. Their task is quite narrow. For example, type approval of measuring instrument or calibration and verification. Due to the fact that the number of such employers and their tasks is relatively small in the field of legal metrology, this paper focuses on the significance of training and qualification of legal metrology officers.

  17. Measurement, Nyquist and Shannon: a view of PMU metrology

    Energy Technology Data Exchange (ETDEWEB)

    Kirkham, Harold; Albu, Mihaela

    2017-03-23

    It is generally understood that in a (digital) measuring system, attention must be paid to the criterion usually identified with the name Nyquist. The paper shows that there is no such a priori requirement. The observations of Nyquist are examined: some may seem unfamiliar. Sampling and measurement are described as different activities. A link to Information Theory is discussed.

  18. A Secure System Architecture for Measuring Instruments in Legal Metrology

    Directory of Open Access Journals (Sweden)

    Daniel Peters

    2015-03-01

    Full Text Available Embedded systems show the tendency of becoming more and more connected. This fact combined with the trend towards the Internet of Things, from which measuring instruments are not immune (e.g., smart meters, lets one assume that security in measuring instruments will inevitably play an important role soon. Additionally, measuring instruments have adopted general-purpose operating systems to offer the user a broader functionality that is not necessarily restricted towards measurement alone. In this paper, a flexible software system architecture is presented that addresses these challenges within the framework of essential requirements laid down in the Measuring Instruments Directive of the European Union. This system architecture tries to eliminate the risks general-purpose operating systems have by wrapping them, together with dedicated applications, in secure sandboxes, while supervising the communication between the essential parts and the outside world.

  19. Determination of validation threshold for coordinate measuring methods using a metrological compatibility model

    Science.gov (United States)

    Gromczak, Kamila; Gąska, Adam; Kowalski, Marek; Ostrowska, Ksenia; Sładek, Jerzy; Gruza, Maciej; Gąska, Piotr

    2017-01-01

    The following paper presents a practical approach to the validation process of coordinate measuring methods at an accredited laboratory, using a statistical model of metrological compatibility. The statistical analysis of measurement results obtained using a highly accurate system was intended to determine the permissible validation threshold values. The threshold value constitutes the primary criterion for the acceptance or rejection of the validated method, and depends on both the differences between measurement results with corresponding uncertainties and the individual correlation coefficient. The article specifies and explains the types of measuring methods that were subject to validation and defines the criterion value governing their acceptance or rejection in the validation process.

  20. Quantum metrology. Optically measuring force near the standard quantum limit.

    Science.gov (United States)

    Schreppler, Sydney; Spethmann, Nicolas; Brahms, Nathan; Botter, Thierry; Barrios, Maryrose; Stamper-Kurn, Dan M

    2014-06-27

    The Heisenberg uncertainty principle sets a lower bound on the noise in a force measurement based on continuously detecting a mechanical oscillator's position. This bound, the standard quantum limit, can be reached when the oscillator subjected to the force is unperturbed by its environment and when measurement imprecision from photon shot noise is balanced against disturbance from measurement back-action. We applied an external force to the center-of-mass motion of an ultracold atom cloud in a high-finesse optical cavity and measured the resulting motion optically. When the driving force is resonant with the cloud's oscillation frequency, we achieve a sensitivity that is a factor of 4 above the standard quantum limit and consistent with theoretical predictions given the atoms' residual thermal disturbance and the photodetection quantum efficiency.

  1. Ocular microtremor measurement using laser-speckle metrology

    Science.gov (United States)

    Kenny, Emer; Coakley, Davis; Boyle, Gerard

    2013-01-01

    We describe a novel, noninvasive measurement approach for recording a small involuntary tremor of the eye known as ocular microtremor. The method is based on measuring out-of-plane angular displacements of a target by using laser-speckle correlation of images recorded in the Fourier plane of a lens. The system has a dynamic range of 4 to 5000 μrad, resolution of 4 μrad, and a bandwidth of 250 Hz. The design and optimization of the system is presented with an in vitro validation of the system against its specification.

  2. Data Modeling for Measurements in the Metrology and Testing Fields

    CERN Document Server

    Pavese, Franco

    2009-01-01

    Offers a comprehensive set of modeling methods for data and uncertainty analysis. This work develops methods and computational tools to address general models that arise in practice, allowing for a more valid treatment of calibration and test data and providing an understanding of complex situations in measurement science

  3. Conservative error measures for classical and quantum metrology

    CERN Document Server

    Tsang, Mankei

    2016-01-01

    The classical and quantum Cram\\'er-Rao bounds have become standard measures of parameter-estimation uncertainty for a variety of sensing and imaging applications in recent years, but their assumption of unbiased estimators potentially undermines their significance as fundamental limits. In this note we advocate a Bayesian approach with Van Trees inequalities and worst-case priors to overcome the problem. Applications to superlocalization and gravitational-wave parameter estimation are discussed.

  4. A Century of Acoustic Metrology

    DEFF Research Database (Denmark)

    Rasmussen, Knud

    1998-01-01

    The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect.......The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect....

  5. Advanced metrology of surface defects measurement for aluminum die casting

    Directory of Open Access Journals (Sweden)

    D. Myszka

    2011-07-01

    Full Text Available The scientific objective of the research is to develop a strategy to build computer based vision systems for inspection of surface defects inproducts, especially discontinuities which appear in castings after machining. In addition to the proposed vision inspection method theauthors demonstrates the development of the advanced computer techniques based on the methods of scanning to measure topography ofsurface defect in offline process control. This method allow to identify a mechanism responsible for the formation of casting defects. Also,the method allow investigating if the, developed vision inspection system for identification of surface defects have been correctlyimplemented for an online inspection. Finally, in order to make casting samples with gas and shrinkage porosity defects type, the LGT gas meter was used . For this task a special camera for a semi-quantitative assessment of the gas content in aluminum alloy melts, using a Straube-Pfeiffer method was used. The results demonstrate that applied solution is excellent tool in preparing for various aluminum alloysthe reference porosity samples, identified next by the computer inspection system.

  6. Negative Capability? Measuring the Unmeasurable in Education

    Science.gov (United States)

    Unterhalter, Elaine

    2017-01-01

    This introductory article to the special issue of "Comparative Education" on measuring the unmeasurable in education considers measurement as reflecting facts and uncertainties. The notion of negative capability is used metaphorically to depict some limits of what is measurable, and portray aspects of the process of education, associated…

  7. NIF Target Assembly Metrology Methodology and Results

    Energy Technology Data Exchange (ETDEWEB)

    Alger, E. T. [General Atomics, San Diego, CA (United States); Kroll, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Dzenitis, E. G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Montesanti, R. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Hughes, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Swisher, M. [IAP, Livermore, CA (United States); Taylor, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Segraves, K. [IAP, Livermore, CA (United States); Lord, D. M. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Reynolds, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Castro, C. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Edwards, G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2011-01-01

    During our inertial confinement fusion (ICF) experiments at the National Ignition Facility (NIF) we require cryogenic targets at the 1-cm scale to be fabricated, assembled, and metrologized to micron-level tolerances. During assembly of these ICF targets, there are physical dimensmetrology is completed using optical coordinate measurement machines that provide repeatable measurements with micron precision, while also allowing in-process data collection for absolute accuracy in assembly. To date, 51 targets have been assembled and metrologized, and 34 targets have been successfully fielded on NIF relying on these metrology data. In the near future, ignition experiments on NIF will require tighter tolerances and more demanding target assembly and metrology capability. Metrology methods, calculations, and uncertainty estimates will be discussed. Target diagnostic port alignment, target position, and capsule location results will be reviewed for the 2009 Energetics Campaign. The information is presented via control charts showing the effect of process improvements that were made during target production. Certain parameters, including capsule position, met the 2009 campaign specifications but will have much tighter requirements in the future. Finally, in order to meet these new requirements assembly process changes and metrology capability upgrades will be necessary.

  8. Three-dimensional metrology for printed electronics

    Science.gov (United States)

    Bromberg, Vadim; Harding, Kevin

    2017-05-01

    Novel materials and printing technologies can enable rapid and low cost prototyping and manufacturing of electronic devices with increased flexibility and complexity. However, robust and on-demand printing of circuits will require accurate metrology methods that can measure micron level patterns to verify proper production. This paper presents an evaluation of a range of optical gaging tools ranging from confocal to area 3D systems to determine metrological capability for a range of key parameters from trace thickness to solder paste volumes. Finally, this paper will present a select set of optimized measurement tools detailing both capabilities and gaps in the available technologies needed to fully realize the potential of printed electronics.

  9. New approaches in diffraction based optical metrology

    Science.gov (United States)

    Ebert, M.; Vanoppen, P.; Jak, M.; v. d. Zouw, G.; Cramer, H.; Nooitgedagt, T.; v. d. Laan, H.

    2016-03-01

    Requirements for on-product overlay, focus and CD uniformity continue to tighten in order to support the demands of 10nm and 7nm nodes. This results in the need for simultaneously accurate, robust and dense metrology data as input for closed-loop control solutions thereby enabling wafer-level control and high order corrections. In addition the use of opaque materials and stringent design rules drive the need for expansion of the available measurement wavelengths and metrology target design space. Diffraction based optical metrology has been established as the leading methodology for integrated as well as standalone optical metrology for overlay, focus and CD monitoring and control in state of the art chip manufacturing. We are presenting the new approaches to diffraction based optical metrology designed to meet the processing diffraction based metrology signals. In this paper we will present the new detection principle and its impact on key performance characteristics of overlay and focus measurements. We will also describe the wide range of applications of a newly introduced increased measurement spot size, enabling significant improvements to accuracy and process robustness of overlay and focus measurements. With the YS350E the optical CD measurement capability is also extended, to 10x10μm2 targets. We will discuss the performance and value of small targets in after-develop and after-etch applications.

  10. Consultative committee on ionizing radiation: Impact on radionuclide metrology.

    Science.gov (United States)

    Karam, L R; Ratel, G

    2016-03-01

    In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM's consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence.

  11. Measurement capability overview in PolyNano

    DEFF Research Database (Denmark)

    Calaon, Matteo; Tosello, Guido; Hansen, Hans Nørgaard

    2012-01-01

    requirements such as low uncertainty, high repeatability and resolution, adequate measuring range and availability among the different project partners. Based on the present measurement capability overview and in relation to the objective of PolyNano to “remove the technology barrier between lab‐scale proof......A measurement capability overview has been conducted to evaluate, among the most used instruments in the field of nanometrology, where the PolyNano project should focus its research. The deliverable presents the most relevant instruments to achieve the best possible measurements accuracy matching...... of principle and high volume low cost production”, WP6 future work will be on standardizing new measuring methods through traceable procedures which will enable product quality control implemented in‐line with micro/nano manufacturing processing technologies....

  12. Metrological challenges for measurements of key climatological observables. Part 4: atmospheric relative humidity

    Science.gov (United States)

    Lovell-Smith, J. W.; Feistel, R.; Harvey, A. H.; Hellmuth, O.; Bell, S. A.; Heinonen, M.; Cooper, J. R.

    2016-02-01

    Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth’s radiation balance, atmospheric water vapour is the strongest ‘greenhouse’ gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. In this paper, we examine the climatologically relevant atmospheric relative humidity, noting fundamental deficiencies in the definition of this key observable. The metrological history of this quantity is reviewed, problems with its current definition and measurement practice are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures (BIPM), in cooperation with the International Association for the Properties of Water and Steam (IAPWS), along with other international organizations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions, such as are suggested here, for what are long-standing metrological problems.

  13. UPWIND Metrology, Deliverable D 1A2.1, List of measurement Parameters

    DEFF Research Database (Denmark)

    Hansen, Kurt Schaldemose

    as convincing field tests have not confirmed the actual improvement, the industry will not invest much to change the turbine design. This is an example that clarifies why the development of wind energy is hindered by metrology problems (measurement problems). Other examples are in the fields of: - Warranty...... activity. The problem is especially relevant for the following areas: Production related - Power performance testing especially in wind farms - Testing of turbine improvements in the order of several percent - Testing of aerodynamic codes - Testing of turbine response to effects such as turbulence...... and shear Load related - Mechanical load measurements in farms aimed at verification of aero elastic codes. (blade root moments, yaw moments, tower foot moments etc.) Wind related - Measurement of wake effects and wind resources inside wind farms - Measurements of inter farm effects (regarding velocity...

  14. Temperature metrology

    Science.gov (United States)

    Fischer, J.; Fellmuth, B.

    2005-05-01

    The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

  15. Automatic Three-Dimensional Measurement of Large-Scale Structure Based on Vision Metrology

    Directory of Open Access Journals (Sweden)

    Zhaokun Zhu

    2014-01-01

    Full Text Available All relevant key techniques involved in photogrammetric vision metrology for fully automatic 3D measurement of large-scale structure are studied. A new kind of coded target consisting of circular retroreflective discs is designed, and corresponding detection and recognition algorithms based on blob detection and clustering are presented. Then a three-stage strategy starting with view clustering is proposed to achieve automatic network orientation. As for matching of noncoded targets, the concept of matching path is proposed, and matches for each noncoded target are found by determination of the optimal matching path, based on a novel voting strategy, among all possible ones. Experiments on a fixed keel of airship have been conducted to verify the effectiveness and measuring accuracy of the proposed methods.

  16. Nuclear Technology. Course 27: Metrology. Module 27-8, The Total Measurement System.

    Science.gov (United States)

    General Physics Corp., Columbia, MD.

    This eighth in a series of eight modules for a course titled Metrology describes the overall metrology program and the associated typical responsibilities of the quality assurance/quality control technician. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4)…

  17. Nuclear Technology. Course 27: Metrology. Module 27-8, The Total Measurement System.

    Science.gov (United States)

    General Physics Corp., Columbia, MD.

    This eighth in a series of eight modules for a course titled Metrology describes the overall metrology program and the associated typical responsibilities of the quality assurance/quality control technician. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4)…

  18. Wavefront metrology measurements at SACLA by means of X-ray grating interferometry.

    Science.gov (United States)

    Kayser, Yves; Rutishauser, Simon; Katayama, Tetsuo; Ohashi, Haruhiko; Kameshima, Takashi; Flechsig, Uwe; Yabashi, Makina; David, Christian

    2014-04-21

    The knowledge of the X-ray wavefront is of importance for many experiments at synchrotron sources and hard X-ray free-electron lasers. We will report on metrology measurements performed at the SACLA X-ray Free Electron Laser by means of grating interferometry which allows for an at-wavelength, in-situ, and single-shot characterization of the X-ray wavefront. At SACLA the grating interferometry technique was used for the study of the X-ray optics installed upstream of the end station, two off-set mirror systems and a double crystal monochromator. The excellent quality of the optical components was confirmed by the experimental results. Consequently grating interferometry presents the ability to support further technical progresses in X-ray mirror manufacturing and mounting.

  19. Measuring up to the challenges of the 21st century. An international evaluation of the Centre for Metrology and Accreditation

    Energy Technology Data Exchange (ETDEWEB)

    Clapman, P.; Kaarls, R.; Temmes, M.

    1997-04-01

    The international evaluation of the Centre for Metrology and Accreditation (MIKES) is part of the process in which all relevant industrial and technology policy measures and organizations under the auspices of the Ministry of Trade and Industry (MTI) are being evaluated with the aim of improving their effectiveness. The overall conclusion of the evaluation is that MIKES is serving the country well. An effective national measurement system (FINMET) is being maintained which provides a wide range of calibration services covering most of the nation`s needs. The accreditation service (FINAS) is now well established, is operating effectively, and has good prospects for growth. The evaluators present, however, a number of proposals (including 33 specific recommendations) where they feel that the metrology and accreditation arrangements could be better-suited to meet future national and international challenges. According to the recommendations the Finnish quality policy framework should be developed in a consistent way. There is a need of a comprehensive governmental quality policy statement upon which the inter-ministry coordination and harmonization of various conformity assessment activities can be based. MIKES should retain its current status as an agency within MTI. The national measurement system should be more centralised and a new purpose-built national standards laboratory should be procured. The responsibility for legal metrology should be transferred to MIKES. The terms of reference and membership of Advisory Committee for Metrology, as well as the Advisory Committee for Accreditation should be revised to ensure wider representation of all relevant, and especially industrial interests

  20. Industrial graphene metrology.

    Science.gov (United States)

    Kyle, Jennifer Reiber; Ozkan, Cengiz S; Ozkan, Mihrimah

    2012-07-07

    Graphene is an allotrope of carbon whose structure is based on one-atom-thick planar sheets of carbon atoms that are densely packed in a honeycomb crystal lattice. Its unique electrical and optical properties raised worldwide interest towards the design and fabrication of future electronic and optical devices with unmatched performance. At the moment, extensive efforts are underway to evaluate the reliability and performance of a number of such devices. With the recent advances in synthesizing large-area graphene sheets, engineers have begun investigating viable methodologies for conducting graphene metrology and quality control at industrial scales to understand a variety of reliability issues including defects, patternability, electrical, and physical properties. This review summarizes the current state of industrial graphene metrology and provides an overview of graphene metrology techniques. In addition, a recently developed large-area graphene metrology technique based on fluorescence quenching is introduced. For each metrology technique, the industrial metrics it measures are identified--layer thickness, edge structure, defects, Fermi level, and thermal conductivity--and a detailed description is provided as to how the measurements are performed. Additionally, the potential advantages of each technique for industrial use are identified, including throughput, scalability, sensitivity to substrate/environment, and on their demonstrated ability to achieve quantified results. The recently developed fluorescence-quenching metrology technique is shown to meet all the necessary criteria for industrial applications, rendering it the first industry-ready graphene metrology technique.

  1. Investigation of metrological parameters of measuring system for small temperature changes

    Directory of Open Access Journals (Sweden)

    Samynina M. G.

    2014-02-01

    Full Text Available Metrological parameters of the non-standard contact device were investigated to characterize its performance in temperature change measurements in the specified temperature range. Several series thermistors with a negative temperature coefficient of resistance connected into a linearization circuit were used as the sensing element of the semiconductor device. Increasing the number of thermistors leads to improved circuitry resolving power and reduced dispersion of this parameter. However, there is the question of optimal ratio of the number of thermistors and implemented temperature resolution, due to the nonlinear resolution dependence of the number of series-connected thermoelements. An example of scheme of four similar thermistors as the primary sensor and of a standard measuring instrument, which is working in ohmmeter mode, shows the ability to measure temperature changes at the level of hundredth of a Celsius degree. In this case, a quantization error, which is determined by a resolution of the measuring system, and the ohmmeter accuracy make the main contribution to the overall accuracy of measuring small temperature changes.

  2. Selecting Capabilities for Quality of Life Measurement

    Science.gov (United States)

    Robeyns, Ingrid

    2005-01-01

    The capability approach advocates that interpersonal comparisons be made in the space of functionings and capabilities. However, Amartya Sen has not specified which capabilities should be selected as the relevant ones. This has provoked two types of criticism. The stronger critique is Martha Nussbaum's claim that Sen should endorse one specific…

  3. Metrological characterization of a large aperture Fizeau for x-ray mirrors measurement

    Science.gov (United States)

    Vannoni, Maurizio; Freijo Martín, Idoia

    2015-06-01

    The European XFEL is a large facility under construction in Hamburg, Germany. It will provide a transversally fully coherent x-ray radiation with outstanding characteristics: high repetition rate (up to 2700 pulses with a 0.6 milliseconds long pulse train at 10Hz), short wavelength (down to 0.05 nm), short pulse (in the femtoseconds scale) and high average brilliance (1.61025 photons / s / mm2 / mrad2/ 0.1% bandwidth). Due to the very short wavelength and very high pulse energy, all the mirrors need to have high quality surface, to be very long, and at the same time to implement an effective cooling system. Matching these tight specifications and assessing them with high precision optical measurements is very challenging. In order to measure the mirrors and to characterize their interaction with the mechanical mounts, we equipped a Metrology Laboratory with a Large Aperture Fizeau. The system is a classical 100 mm diameter commercial Fizeau, with an additional expander providing a 300 mm diameter. Despite the commercial nature of the system, special care has been done in the polishing of the reference flats and in the expander quality. In this report, we show the preparation of the instrument, the calibration and the performance characterization, together with some preliminary results. We also describe the approach that we want to follow for the x-rays mirrors measurements. The final goal will be to characterize very long mirrors, almost 1 meter long, with nanometer accuracy.

  4. CAPABILITY ASSESSMENT OF MEASURING EQUIPMENT USING STATISTIC METHOD

    Directory of Open Access Journals (Sweden)

    Pavel POLÁK

    2014-10-01

    Full Text Available Capability assessment of the measurement device is one of the methods of process quality control. Only in case the measurement device is capable, the capability of the measurement and consequently production process can be assessed. This paper deals with assessment of the capability of the measuring device using indices Cg and Cgk.

  5. FOREWORD: Materials metrology Materials metrology

    Science.gov (United States)

    Bennett, Seton; Valdés, Joaquin

    2010-04-01

    It seems that so much of modern life is defined by the materials we use. From aircraft to architecture, from cars to communications, from microelectronics to medicine, the development of new materials and the innovative application of existing ones have underpinned the technological advances that have transformed the way we live, work and play. Recognizing the need for a sound technical basis for drafting codes of practice and specifications for advanced materials, the governments of countries of the Economic Summit (G7) and the European Commission signed a Memorandum of Understanding in 1982 to establish the Versailles Project on Advanced Materials and Standards (VAMAS). This project supports international trade by enabling scientific collaboration as a precursor to the drafting of standards. The VAMAS participants recognized the importance of agreeing a reliable, universally accepted basis for the traceability of the measurements on which standards depend for their preparation and implementation. Seeing the need to involve the wider metrology community, VAMAS approached the Comité International des Poids et Mesures (CIPM). Following discussions with NMI Directors and a workshop at the BIPM in February 2005, the CIPM decided to establish an ad hoc Working Group on the metrology applicable to the measurement of material properties. The Working Group presented its conclusions to the CIPM in October 2007 and published its final report in 2008, leading to the signature of a Memorandum of Understanding between VAMAS and the BIPM. This MoU recognizes the work that is already going on in VAMAS as well as in the Consultative Committees of the CIPM and establishes a framework for an ongoing dialogue on issues of materials metrology. The question of what is meant by traceability in the metrology of the properties of materials is particularly vexed when the measurement results depend on a specified procedure. In these cases, confidence in results requires not only traceable

  6. Absolute Position of Targets Measured Through a Chamber Window Using Lidar Metrology Systems

    Science.gov (United States)

    Kubalak, David; Hadjimichael, Theodore; Ohl, Raymond; Slotwinski, Anthony; Telfer, Randal; Hayden, Joseph

    2012-01-01

    Lidar is a useful tool for taking metrology measurements without the need for physical contact with the parts under test. Lidar instruments are aimed at a target using azimuth and elevation stages, then focus a beam of coherent, frequency modulated laser energy onto the target, such as the surface of a mechanical structure. Energy from the reflected beam is mixed with an optical reference signal that travels in a fiber path internal to the instrument, and the range to the target is calculated based on the difference in the frequency of the returned and reference signals. In cases when the parts are in extreme environments, additional steps need to be taken to separate the operator and lidar from that environment. A model has been developed that accurately reduces the lidar data to an absolute position and accounts for the three media in the testbed air, fused silica, and vacuum but the approach can be adapted for any environment or material. The accuracy of laser metrology measurements depends upon knowing the parameters of the media through which the measurement beam travels. Under normal conditions, this means knowledge of the temperature, pressure, and humidity of the air in the measurement volume. In the past, chamber windows have been used to separate the measuring device from the extreme environment within the chamber and still permit optical measurement, but, so far, only relative changes have been diagnosed. The ability to make accurate measurements through a window presents a challenge as there are a number of factors to consider. In the case of the lidar, the window will increase the time-of-flight of the laser beam causing a ranging error, and refract the direction of the beam causing angular positioning errors. In addition, differences in pressure, temperature, and humidity on each side of the window will cause slight atmospheric index changes and induce deformation and a refractive index gradient within the window. Also, since the window is a

  7. Metrology For Emerging Research Materials And Devices

    Science.gov (United States)

    Garner, C. Michael; Herr, Dan

    2007-09-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] identifies a number of potentially enabling device and materials technologies to extend and compliment CMOS. These emerging memory and logic devices employ alternate "states" including 1D charge state, molecular state, polarization, material phase, and spin. The improvement of these materials and devices depends on utilizing existing and new metrology methods to characterize their structure, composition and emerging critical properties at the nanometer scale. The metrology required to characterize nanomaterials, interfaces, and device structures will include existing structural metrology, such as TEM, SEM, and others, as well as metrology to characterize new "state" properties of the materials. The characterization of properties and correlations to nanostructure and composition are critical for these new devices and materials. Characterizing the properties of emerging logic technologies will be very difficult, as an applied stimulus is required to probe dynamic state changes. In many cases, it will be important simultaneously to measure the spatial variation of multiple state properties, such as charge and spin, as a function of time at high frequencies to develop an understanding of the interactions occurring in the materials and at interfaces. Furthermore, the challenge of characterizing interface structure/composition and "state" interactions likely will increase with device scaling. New metrology capabilities are needed to study the static and dynamic properties of potential alternate "state" materials and devices at small dimensions.

  8. 军工计量与市场营销%Metrology and Measurement for Military and Marketing

    Institute of Scientific and Technical Information of China (English)

    张晓蕾

    2014-01-01

    With the rapid development of metrology and measurement for military, measurement is not only national statutory, but also with social competition in the market. Therefore, marketing has been one of the most important subjects that can raise a corporation of metrology and measurement for military to a more important rank. It is an important issue that how to make a strategic planning with a feature of metrology and measurement for military combined with such an actual condition nowadays. This text ana-lyzes the environment of the corporation of metrology and measurement for military and makes the relevant strategic planning of marketing according to the environment nowadays.%在军工计量行业快速发展的时代,计量已不仅仅具有国家法定性,它作为服务性行业同样具有市场竞争的社会性,因此,市场营销成为现代军工计量企业发展所需的重要学科。如何在当前形势下结合军工计量企业的实际情况,制定出具有军工计量特色的市场营销战略规划,是一个非常重要的问题。本文对现代军工计量企业的环境进行了分析,结合环境分析选择了相应的市场营销战略规划。

  9. Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry.

    Science.gov (United States)

    Zhu, Jinlong; Shi, Yating; Goddard, Lynford L; Liu, Shiyuan

    2016-09-01

    Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a pseudo Jacobian with respect to the measurement configurations. Simulations and experiments for the optical metrology of a sub-wavelength deep-etched multilayer grating establish the feasibility of the proposed method.

  10. A low cost scheme for high precision dual-wavelength laser metrology

    CERN Document Server

    Kok, Yitping; Robertson, J Gordon; Tuthill, Peter G; Warrington, Benjamin A; Tango, William J

    2013-01-01

    A novel method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dual-wavelength metrology which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measurement. Although the method may be applicable to a variety of circumstances, the specific application where this metrology is essential is in an astrometric optical long baseline stellar interferometer dedicated to precise measurement of stellar positions. In our example application of this metrology to a narrow-angle astrometric interferometer, measurement of nanometer precision could be achieved without frequency-stabilized lasers although the use of such lasers would extend the range of optical path length the metrology can accurately measure. Implementation of the method requires very little additional optics or el...

  11. Metrologically speaking

    Science.gov (United States)

    Hansen, Matthew E.

    2008-08-01

    Optical metrology is a science and an art. Education in the engineering disciplines concentrates on technical knowledge transfer. However, creativity and imagination are required in partnership with these technical skills to generate truly innovative results. This presentation investigates strategies and methodologies of working in which the exploration of potential solutions to optical metrology problems becomes more of a creative process than the strict application of technical know-how.

  12. Impact of shrinking measurement error budgets on qualification metrology sampling and cost

    Science.gov (United States)

    Sendelbach, Matthew; Sarig, Niv; Wakamoto, Koichi; Kim, Hyang Kyun (Helen); Isbester, Paul; Asano, Masafumi; Matsuki, Kazuto; Vaid, Alok; Osorio, Carmen; Archie, Chas

    2014-04-01

    When designing an experiment to assess the accuracy of a tool as compared to a reference tool, semiconductor metrologists are often confronted with the situation that they must decide on the sampling strategy before the measurements begin. This decision is usually based largely on the previous experience of the metrologist and the available resources, and not on the statistics that are needed to achieve acceptable confidence limits on the final result. This paper shows a solution to this problem, called inverse TMU analysis, by presenting statistically-based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk vs. reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope (CD-SEM) tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions before the start of the experiment, and then to reveal why low sampling can lead to unstable and misleading results. A model is developed that can help an experimenter minimize the costs associated both with increased sampling and with making wrong decisions caused by insufficient sampling. A second cost model is described that reveals the inadequacy of current TEM (Transmission Electron Microscopy) sampling practices and the enormous costs associated with TEM sampling that is needed to provide reasonable levels of certainty in the result. These high costs reach into the tens of millions of dollars for TEM reference metrology as the measurement error budgets reach angstrom levels. The paper concludes with strategies on how to manage and mitigate these costs.

  13. Economic benefits of metrology in manufacturing

    DEFF Research Database (Denmark)

    Savio, Enrico; De Chiffre, Leonardo; Carmignato, S.

    2016-01-01

    In streamlined manufacturing systems, the added value of inspection activities is often questioned, and metrology in particular is sometimes considered only as an avoidable expense. Documented quantification of economic benefits of metrology is generally not available. This work presents concrete...... examples from industrial production, in which the added value of metrology in manufacturing is discussed and quantified. Case studies include: general manufacturing, forging, machining, and related metrology. The focus of the paper is on the improved effectiveness of metrology when used at product...... and process design stages, as well as on the improved accuracy and efficiency of manufacturing through better measuring equipment and process chains with integrated metrology for process control....

  14. Metrological Traceability in the Social Sciences: A Model from Reading Measurement

    Science.gov (United States)

    Stenner, A. Jackson; Fisher, William P., Jr.

    2013-09-01

    The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia.

  15. Experimental and Metrological Basis for SI-Traceable Infrared Radiance Measurements From Space

    Science.gov (United States)

    Gero, P. J.; Dykema, J. A.; Anderson, J. G.; Leroy, S. S.

    2007-12-01

    In order to establish a climate benchmark record and to be useful in interdecadal climate forecast testing, satellite measurements of high spectral resolution infrared radiance must have uncertainty estimates that can be proven beyond a doubt. An uncertainty in radiance of about 1 part in 1000 is required for climate applications. This can be accomplished by appealing to the best measurement practices of the metrology community. The International System of Units (SI) are linked to fundamental physical properties of matter, and can be realized anywhere in the world without bias. By doing so, one can make an accurate observation to within a specified uncertainty. Achieving SI-traceable radiance measurements from space is a novel requirement, and requires specialized sensor design and a disciplined experimental approach. Infrared remote sensing satellite instruments typically employ blackbody calibration targets, which are tied to the SI through Planck's law and the definition of the Kelvin. The blackbody temperature and emissivity, however, must be determined accurately on- orbit, in order for the blackbody emission scale to be SI-traceable. We outline a methodology of instrument design, pre-flight calibration and on-orbit diagnostics for realizing SI- traceable infrared radiance measurements. This instrument is intended as a component of the Climate Absolute Radiance and Refractivity Earth Observatory (CLARREO), a high priority recommendation of the National Research Council decadal survey. Calibration blackbodies for remote sensing differ from a perfect Planckian blackbody; thus the component uncertainties must be evaluated in order to confer traceability. We have performed traceability experiments in the laboratory to verify blackbody temperature, emissivity and the end-to-end radiance scale. We discuss the design of the Harvard standard blackbody and an intercomparison campaign that will be conducted with the GIFTS blackbody (University of Wisconsin, Madison) and

  16. EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

    Science.gov (United States)

    Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

    2016-04-01

    Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The

  17. Advances in the atomic force microscopy for critical dimension metrology

    Science.gov (United States)

    Hussain, Danish; Ahmad, Khurshid; Song, Jianmin; Xie, Hui

    2017-01-01

    Downscaling, miniaturization and 3D staking of the micro/nano devices are burgeoning phenomena in the semiconductor industry which have posed sophisticated challenges in the critical dimension (CD) metrology. Over the past few years, atomic force microscopy (AFM) has emerged as an important CD metrology technique in meeting these challenges because of its high accuracy, 3D imaging capability, high spatial resolution and non-destructive nature. In this article, advances in the AFM based critical dimension (CD) metrology are systematically reviewed and discussed. CD metrology AFM techniques, strengths, limitations and scanning algorithms are described. Developments towards accurate measurements such as creep and hysteresis compensation of the piezoelectric scanners, their calibration and tip characterization are discussed. In addition, image reconstruction and measures for achieving high accuracy CD measurements with hybrid metrology technique are also discussed. CD metrology challenges offered by the next generation lithography (NGL) techniques such as those associated with the 3D nanodevices of 10 nm node and beyond have been highlighted.

  18. Metrological Characterization of an Improved DSP-Based On-line Integrator for Magnetic Measurements at CERN

    CERN Document Server

    Arpaia, P; Spiezia, G

    2007-01-01

    An improved on-line version of the self-calibrating digital instrument for flux measurements on superconductive magnets for particle accelerators, prototyped at the European Organization for Nuclear Research (CERN) in cooperation with the University of Sannio, is proposed. The instrument acquires voltage arising from rotating coils transducers. Then, the samples are online integrated and suitably processed in order to achieve flux analysis time down to 2.0 ìs, with resolution of 50 ns. Details about hardware and firmware conception, on-line measurement principle, and preliminary results of metrological characterization of the prototype are provided.

  19. Validation of a new objective index to measure spinal mobility: the University of Cordoba Ankylosing Spondylitis Metrology Index (UCOASMI).

    Science.gov (United States)

    Garrido-Castro, Juan L; Escudero, Alejandro; Medina-Carnicer, Rafael; Galisteo, Alfonso M; Gonzalez-Navas, Cristina; Carmona, Loreto; Collantes-Estevez, Eduardo

    2014-03-01

    Spinal mobility measures are subject to high variability and subjectivity. Automated motion capture allows an objective and quantitative measure of mobility with high levels of precision. To validate the University of Cordoba Ankylosing Spondylitis Metrology Index (UCOASMI), an index measure of spinal mobility, based on automated motion capture, validation studies included the following: (1) validity, tested by correlation--Pearson's r--between the UCOASMI and the mobility index Bath Ankylosing Spondylitis Metrology Index (BASMI), and a measure of structural damage, the modified Stoke Ankylosing Spondylitis Spinal Score (mSASSS); (2) reliability, with internal consistency tested by Cronbach's alpha, test-retest by intraclass correlation coefficient (ICC) after 2 weeks, and error measurement, by variation coefficient (VC) and smallest detectable difference (SDD); and (3) responsiveness, by effect size (ES) in a clinical trial of anti-TNF. Patients for the different studies all had ankylosing spondylitis. Validity studies show correlation between the BASMI (r = 0.881) and the mSASSS (r = 0.780). Reliability studies show an internal consistency of Cronbach's α = 0.894, intra-observer ICC = 0.996, test-retest ICC = 0.996, and a measurement error of VC = 2.80% and SDD = 0.25 points. Responsiveness showed an ES after 24 weeks of treatment of 0.48. In all studies, the UCOASMI's performance was better than that of the BASMI. The UCOASMI is a validated index to measure spinal mobility with better metric properties than previous indices.

  20. Criterion Validation Testing of Clinical Metrology Instruments for Measuring Degenerative Joint Disease Associated Mobility Impairment in Cats.

    Directory of Open Access Journals (Sweden)

    Margaret E Gruen

    Full Text Available Degenerative joint disease and associated pain are common in cats, particularly in older cats. There is a need for treatment options, however evaluation of putative therapies is limited by a lack of suitable, validated outcome measures that can be used in the target population of client owned cats. The objectives of this study were to evaluate low-dose daily meloxicam for the treatment of pain associated with degenerative joint disease in cats, and further validate two clinical metrology instruments, the Feline Musculoskeletal Pain Index (FMPI and the Client Specific Outcome Measures (CSOM.Sixty-six client owned cats with degenerative joint disease and owner-reported impairments in mobility were screened and enrolled into a double-masked, placebo-controlled, randomized clinical trial. Following a run-in baseline period, cats were given either placebo or meloxicam for 21 days, then in a masked washout, cats were all given placebo for 21 days. Subsequently, cats were given the opposite treatment, placebo or meloxicam, for 21 days. Cats wore activity monitors throughout the study, owners completed clinical metrology instruments following each period.Activity counts were increased in cats during treatment with daily meloxicam (p<0.0001 compared to baseline. The FMPI results and activity count data offer concurrent validation for the FMPI, though the relationship between baseline activity counts and FMPI scores at baseline was poor (R2=0.034. The CSOM did not show responsiveness for improvement in this study, and the relationship between baseline activity counts and CSOM scores at baseline was similarly poor (R2=0.042.Refinements to the FMPI, including abbreviation of the instrument and scoring as percent of possible score are recommended. This study offered further validation of the FMPI as a clinical metrology instrument for use in detecting therapeutic efficacy in cats with degenerative joint disease.

  1. Establishing an infrared measurement and modelling capability

    CSIR Research Space (South Africa)

    Willers, CJ

    2011-04-01

    Full Text Available is supplemented with a considerable body of self-study material, tutorial assignments and laboratory demonstrations. A series of six significant experiments was used to demon- strate, in a practical manner, some future test scenarios and to reinforce... The fourth experiment investigated the applicability of the three imaging cameras? spectral ranges for temperature measurement of objects in the open sunlight. A secondary objective was to determine the true temperature and emissivity of the test targets...

  2. Overview of Mask Metrology

    Science.gov (United States)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  3. Recent Investments by NASA's National Force Measurement Technology Capability

    Science.gov (United States)

    Commo, Sean A.; Ponder, Jonathan D.

    2016-01-01

    The National Force Measurement Technology Capability (NFMTC) is a nationwide partnership established in 2008 and sponsored by NASA's Aeronautics Evaluation and Test Capabilities (AETC) project to maintain and further develop force measurement capabilities. The NFMTC focuses on force measurement in wind tunnels and provides operational support in addition to conducting balance research. Based on force measurement capability challenges, strategic investments into research tasks are designed to meet the experimental requirements of current and future aerospace research programs and projects. This paper highlights recent and force measurement investments into several areas including recapitalizing the strain-gage balance inventory, developing balance best practices, improving calibration and facility capabilities, and researching potential technologies to advance balance capabilities.

  4. How to measure capabilities within corridors?

    Directory of Open Access Journals (Sweden)

    Thomas MACOUN

    2011-01-01

    Full Text Available Traditional methods of measuring the capacities of infrastructures are usually based on indicators like passenger car units (PCU. It is quite clear that these methods of capacity evaluation (categories of roads, calculation procedures, capacity limits, e.g. defined in the HCM – Highway Capacity Manual cannot be used to picture the intermodality of the traffic system. The first step has to include the intermodality (modal split in the cross section of a road (pedestrians, bicycles, public transport, private vehicles, and in a further step it is necessary to account for all alternatives within the corridor, like parallel routed railways or public transport lines, to reach an intermodal point of view. Finally it is also necessary to include the effects on the settlement structure. Beside intermodality, any new method also has to consider cost effectiveness, a comprehensive consideration of feedbacks in the traffic system, as well as compatibility to CBA. As a result it is necessary to find new indicators (instead of car units to define passenger and freight flows. There are guidelines in progress auditing transport operations and infrastructure conditions of roadways. A revision of these guidelines aims to integrate different modes of transport by changing the key-indicators (e.g. incline, curviness, roadway width, capacity utilisation and to use a system approach which includes indicators like modal split, car occupancy or utilised capacity of lorries. The procedure presented in this paper can be seen as one building block to meet the demands of future assessments within corridors.

  5. Laser Metrology in the Micro-Arcsecond Metrology Testbed

    Science.gov (United States)

    An, Xin; Marx, D.; Goullioud, Renaud; Zhao, Feng

    2004-01-01

    The Space Interferometer Mission (SIM), scheduled for launch in 2009, is a space-born visible light stellar interferometer capable of micro-arcsecond-level astrometry. The Micro-Arcsecond Metrology testbed (MAM) is the ground-based testbed that incorporates all the functionalities of SIM minus the telescope, for mission-enabling technology development and verification. MAM employs a laser heterodyne metrology system using the Sub-Aperture Vertex-to-Vertex (SAVV) concept. In this paper, we describe the development and modification of the SAVV metrology launchers and the metrology instrument electronics, precision alignments and pointing control, locating cyclic error sources in the MAM testbed and methods to mitigate the cyclic errors, as well as the performance under the MAM performance metrics.

  6. Metrological challenges for measurements of key climatological observables: oceanic salinity and pH, and atmospheric humidity. Part 1: overview

    Science.gov (United States)

    Feistel, R.; Wielgosz, R.; Bell, S. A.; Camões, M. F.; Cooper, J. R.; Dexter, P.; Dickson, A. G.; Fisicaro, P.; Harvey, A. H.; Heinonen, M.; Hellmuth, O.; Kretzschmar, H.-J.; Lovell-Smith, J. W.; McDougall, T. J.; Pawlowicz, R.; Ridout, P.; Seitz, S.; Spitzer, P.; Stoica, D.; Wolf, H.

    2016-02-01

    Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth’s radiation balance, atmospheric water vapour is the strongest ‘greenhouse’ gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. On climatic time scales, melting ice caps and regional deviations of the hydrological cycle result in changes of seawater salinity, which in turn may modify the global circulation of the oceans and their ability to store heat and to buffer anthropogenically produced carbon dioxide. In this paper, together with three companion articles, we examine the climatologically relevant quantities ocean salinity, seawater pH and atmospheric relative humidity, noting fundamental deficiencies in the definitions of those key observables, and their lack of secure foundation on the International System of Units, the SI. The metrological histories of those three quantities are reviewed, problems with their current definitions and measurement practices are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures, BIPM, in cooperation with the International Association for the Properties of Water and Steam, IAPWS, along with other international organizations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions for these long standing metrological problems in climatology.

  7. Criterion Validation Testing of Clinical Metrology Instruments for Measuring Degenerative Joint Disease Associated Mobility Impairment in Cats

    Science.gov (United States)

    Gruen, Margaret E.; Griffith, Emily H.; Thomson, Andrea E.; Simpson, Wendy; Lascelles, B. Duncan X.

    2015-01-01

    Introduction Degenerative joint disease and associated pain are common in cats, particularly in older cats. There is a need for treatment options, however evaluation of putative therapies is limited by a lack of suitable, validated outcome measures that can be used in the target population of client owned cats. The objectives of this study were to evaluate low-dose daily meloxicam for the treatment of pain associated with degenerative joint disease in cats, and further validate two clinical metrology instruments, the Feline Musculoskeletal Pain Index (FMPI) and the Client Specific Outcome Measures (CSOM). Methods Sixty-six client owned cats with degenerative joint disease and owner-reported impairments in mobility were screened and enrolled into a double-masked, placebo-controlled, randomized clinical trial. Following a run-in baseline period, cats were given either placebo or meloxicam for 21 days, then in a masked washout, cats were all given placebo for 21 days. Subsequently, cats were given the opposite treatment, placebo or meloxicam, for 21 days. Cats wore activity monitors throughout the study, owners completed clinical metrology instruments following each period. Results Activity counts were increased in cats during treatment with daily meloxicam (pcats with degenerative joint disease. PMID:26162101

  8. Metrological challenges for measurements of key climatological observables: Oceanic salinity and pH, and atmospheric humidity. Part 1: Overview.

    Science.gov (United States)

    Feistel, R; Wielgosz, R; Bell, S A; Camões, M F; Cooper, J R; Dexter, P; Dickson, A G; Fisicaro, P; Harvey, A H; Heinonen, M; Hellmuth, O; Kretzschmar, H-J; Lovell-Smith, J W; McDougall, T J; Pawlowicz, R; Ridout, P; Seitz, S; Spitzer, P; Stoica, D; Wolf, H

    2016-02-01

    Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth's radiation balance, atmospheric water vapour is the strongest "greenhouse" gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. On climatic time scales, melting ice caps and regional deviations of the hydrological cycle result in changes of seawater salinity, which in turn may modify the global circulation of the oceans and their ability to store heat and to buffer anthropogenically produced carbon dioxide. In this paper, together with three companion articles, we examine the climatologically relevant quantities ocean salinity, seawater pH and atmospheric relative humidity, noting fundamental deficiencies in the definitions of those key observables, and their lack of secure foundation on the International System of Units, the SI. The metrological histories of those three quantities are reviewed, problems with their current definitions and measurement practices are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures, BIPM, in cooperation with the International Association for the Properties of Water and Steam, IAPWS, along with other international organisations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions for these long standing metrological problems in climatology.

  9. An autonomous multisensor in situ metrology system for enabling high dynamic range measurement of 3D surfaces on precision machine tools

    Science.gov (United States)

    Liu, Samuel M. Y.; Cheung, Benny C. F.; Whitehouse, David; Cheng, Ching-Hsiang

    2016-11-01

    An in situ measurement is of prime importance when trying to maintain the position of the workpiece for further compensation processes in order to improve the accuracy and efficiency of the precision machining of three dimensional (3D) surfaces. However, the coordinates of most of the machine tools with closed machine interfaces and control system are not accessible for users, which make it difficult to use the motion axes of the machine tool for in situ measurements. This paper presents an autonomous multisensor in situ metrology system for enabling high dynamic range measurement of 3D surfaces on precision machine tools. It makes use of a designed tool path and an additional motion sensor to assist the registration of time-space data for the position estimation of a 2D laser scanner which measures the surface with a high lateral resolution and large area without the need to interface with the machine tool system. A prototype system was built and integrated into an ultra-precision polishing machine. Experimental results show that it measures the 3D surfaces with high resolution, high repeatability, and large measurement range. The system not only improves the efficiency and accuracy of the precision machining process but also extends the capability of machine tools.

  10. Computed tomography for dimensional metrology

    DEFF Research Database (Denmark)

    Kruth, J.P.; Bartscher, M.; Carmignato, S.;

    2011-01-01

    metrology, putting emphasis on issues as accuracy, traceability to the unit of length (the meter) and measurement uncertainty. It provides a state of the art (anno 2011) and application examples, showing the aptitude of CT metrology to: (i) check internal dimensions that cannot be measured using traditional...... coordinate measuring machines and (ii) combine dimensional quality control with material quality control in one single quality inspection run....

  11. Low-cost scheme for high-precision dual-wavelength laser metrology.

    Science.gov (United States)

    Kok, Yitping; Ireland, Michael J; Robertson, J Gordon; Tuthill, Peter G; Warrington, Benjamin A; Tango, William J

    2013-04-20

    A method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dual-wavelength metrology, which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measurement. Although the method may be applicable to a variety of circumstances, the specific application in which this metrology is essential is in an astrometric optical long baseline stellar interferometer dedicated to precise measurement of stellar positions. In our example application of this metrology to a narrow-angle astrometric interferometer, measurement of nanometer precision could be achieved without frequency-stabilized lasers, although the use of such lasers would extend the range of optical path length the metrology can accurately measure. Implementation of the method requires very little additional optics or electronics, thus minimizing the cost and effort of implementation. Furthermore, the optical path traversed by the metrology lasers is identical to that of the starlight or science beams, even down to using the same photodetectors, thereby minimizing the noncommon path between metrology and science channels.

  12. Color and appearance metrology facility

    Data.gov (United States)

    Federal Laboratory Consortium — The NIST Physical Measurement Laboratory has established the color and appearance metrology facility to support calibration services for 0°/45° colored samples, 20°,...

  13. Looking at the future of manufacturing metrology: roadmap document of the German VDI/VDE Society for Measurement and Automatic Control

    Directory of Open Access Journals (Sweden)

    J. Berthold

    2013-02-01

    Full Text Available "Faster, safer, more accurately and more flexibly'' is the title of the "manufacturing metrology roadmap'' issued by the VDI/VDE Society for Measurement and Automatic Control (http://www.vdi.de/gma. The document presents a view of the development of metrology for industrial production over the next ten years and was drawn up by a German group of experts from research and industry. The following paper summarizes the content of the roadmap and explains the individual concepts of "Faster, safer, more accurately and more flexibly'' with the aid of examples.

  14. Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings.

    Science.gov (United States)

    van Haver, Sven; Coene, Wim M J; D'havé, Koen; Geypen, Niels; van Adrichem, Paul; de Winter, Laurens; Janssen, Augustus J E M; Cheng, Shaunee

    2014-04-20

    In this paper, a new methodology is presented to derive the aberration state of a lithographic projection system from wafer metrology data. For this purpose, new types of phase-shift gratings (PSGs) are introduced, with special features that give rise to a simple linear relation between the PSG image displacement and the phase aberration function of the imaging system. By using the PSGs as the top grating in a diffraction-based overlay stack, their displacement can be measured as an overlay error using a standard wafer metrology tool. In this way, the overlay error can be used as a measurand based on which the phase aberration function in the exit pupil of the lithographic system can be reconstructed. In practice, the overlay error is measured for a set of different PSG targets, after which this information serves as input to a least-squares optimization problem that, upon solving, provides estimates for the Zernike coefficients describing the aberration state of the lithographic system. In addition to a detailed method description, this paper also deals with the additional complications that arise when the method is implemented experimentally and this leads to a number of model refinements and a required calibration step. Finally, the overall performance of the method is assessed through a number of experiments in which the aberration state of the lithographic system is intentionally detuned and subsequently estimated by the new method. These experiments show a remarkably good agreement, with an error smaller than 5  mλ, among the requested aberrations, the aberrations measured by the on-tool aberration sensor, and the results of the new wafer-based method.

  15. The Development of a Deflectometer for Accurate Surface Figure Metrology

    Science.gov (United States)

    Gubarev, Mikhail; Eberhardt, Andrew; Ramsey, Brian; Atkins, Carolyn

    2015-01-01

    Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication

  16. Process window metrology

    Science.gov (United States)

    Ausschnitt, Christopher P.; Chu, William; Hadel, Linda M.; Ho, Hok; Talvi, Peter

    2000-06-01

    This paper is the third of a series that defines a new approach to in-line lithography control. The first paper described the use of optically measurable line-shortening targets to enhance signal-to-noise and reduce measurement time. The second described the dual-tone optical critical dimension (OCD) measurement and analysis necessary to distinguish dose and defocus. Here we describe the marriage of dual-tone OCD to SEM-CD metrology that comprises what we call 'process window metrology' (PWM), the means to locate each measured site in dose and focus space relative to the allowed process window. PWM provides in-line process tracking and control essential to the successful implementation of low-k lithography.

  17. Talking about Metrology and Energy On World Metrology Day

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    @@ The theme of this year's World Metrology Day is "Metrology and Energy". The energy problem is an important issue for the whole world and has received great attention in China since China is both a big energy-consuming country and a country severely short of energy.Under the energy and environmental pressure, China will take measures in the following four respects in order to solve the problem of energy shortage:

  18. Metrology of IXO Mirror Segments

    Science.gov (United States)

    Chan, Kai-Wing

    2011-01-01

    For future x-ray astrophysics mission that demands optics with large throughput and excellent angular resolution, many telescope concepts build around assembling thin mirror segments in a Wolter I geometry, such as that originally proposed for the International X-ray Observatory. The arc-second resolution requirement posts unique challenges not just for fabrication, mounting but also for metrology of these mirror segments. In this paper, we shall discuss the metrology of these segments using normal incidence metrological method with interferometers and null lenses. We present results of the calibration of the metrology systems we are currently using, discuss their accuracy and address the precision in measuring near-cylindrical mirror segments and the stability of the measurements.

  19. On the Capability of Measurement-Based Quantum Feedback

    CERN Document Server

    Qi, Bo; Guo, Lei

    2010-01-01

    As a key method in dealing with uncertainties, feedback has been understood fairly well in classical control theory. But for quantum control systems, the capability of measurement-based feedback control (MFC) has not been investigated systematically. In contrast to the control of classical systems where the measurement effect is negligible, the quantum measurement will cause a quantum state to collapse, which will inevitably introduce additional uncertainties besides the system initial uncertainty. Therefore, there is a complicated tradeoff between the uncertainty introduced and the information gained by the measurement, and thus a theoretical investigation of the capability of MFC is of fundamental importance. In this paper, inspired by both the Heisenberg uncertainty principle for quantum systems and the investigation of the feedback capability for classical systems, we try to answer the following three basic questions: (i) How to choose the measurement channel appropriately? (ii) Is the MFC still superior ...

  20. Coupling of relative intensity noise and pathlength noise to the length measurement in the optical metrology system of LISA Pathfinder

    Science.gov (United States)

    Wittchen, Andreas; the LPF Collaboration

    2017-05-01

    LISA Pathfinder is a technology demonstration mission for the space-based gravitational wave observatory, LISA. It demonstrated that the performance requirements for the interferometric measurement of two test masses in free fall can be met. An important part of the data analysis is to identify the limiting noise sources. [1] This measurement is performed with heterodyne interferometry. The performance of this optical metrology system (OMS) at high frequencies is limited by sensing noise. One such noise source is Relative Intensity Noise (RIN). RIN is a property of the laser, and the photodiode current generated by the interferometer signal contains frequency dependant RIN. From this electric signal the phasemeter calculates the phase change and laser power, and the coupling of RIN into the measurement signal depends on the noise frequency. RIN at DC, at the heterodyne frequency and at two times the heterodyne frequency couples into the phase. Another important noise at high frequencies is path length noise. To reduce the impact this noise is suppressed with a control loop. Path length noise not suppressed will couple directly into the length measurement. The subtraction techniques of both noise sources depend on the phase difference between the reference signal and the measurement signal, and thus on the test mass position. During normal operations we position the test mass at the interferometric zero, which is optimal for noise subtraction purposes. This paper will show results from an in-flight experiment where the test mass position was changed to make the position dependant noise visible.

  1. Quantum metrology and its application in biology

    Science.gov (United States)

    Taylor, Michael A.; Bowen, Warwick P.

    2016-02-01

    Quantum metrology provides a route to overcome practical limits in sensing devices. It holds particular relevance to biology, where sensitivity and resolution constraints restrict applications both in fundamental biophysics and in medicine. Here, we review quantum metrology from this biological context, focusing on optical techniques due to their particular relevance for biological imaging, sensing, and stimulation. Our understanding of quantum mechanics has already enabled important applications in biology, including positron emission tomography (PET) with entangled photons, magnetic resonance imaging (MRI) using nuclear magnetic resonance, and bio-magnetic imaging with superconducting quantum interference devices (SQUIDs). In quantum metrology an even greater range of applications arise from the ability to not just understand, but to engineer, coherence and correlations at the quantum level. In the past few years, quite dramatic progress has been seen in applying these ideas into biological systems. Capabilities that have been demonstrated include enhanced sensitivity and resolution, immunity to imaging artefacts and technical noise, and characterization of the biological response to light at the single-photon level. New quantum measurement techniques offer even greater promise, raising the prospect for improved multi-photon microscopy and magnetic imaging, among many other possible applications. Realization of this potential will require cross-disciplinary input from researchers in both biology and quantum physics. In this review we seek to communicate the developments of quantum metrology in a way that is accessible to biologists and biophysicists, while providing sufficient details to allow the interested reader to obtain a solid understanding of the field. We further seek to introduce quantum physicists to some of the central challenges of optical measurements in biological science. We hope that this will aid in bridging the communication gap that exists

  2. Quantum metrology and its application in biology

    Energy Technology Data Exchange (ETDEWEB)

    Taylor, Michael A. [Centre for Engineered Quantum Systems, University of Queensland, St Lucia, Queensland 4072 (Australia); Research Institute of Molecular Pathology (IMP), Max F. Perutz Laboratories & Research Platform for Quantum Phenomena and Nanoscale Biological Systems (QuNaBioS), University of Vienna, Dr. Bohr Gasse 7-9, A-1030 Vienna (Austria); Bowen, Warwick P., E-mail: w.bowen@uq.edu.au [Centre for Engineered Quantum Systems, University of Queensland, St Lucia, Queensland 4072 (Australia)

    2016-02-23

    Quantum metrology provides a route to overcome practical limits in sensing devices. It holds particular relevance to biology, where sensitivity and resolution constraints restrict applications both in fundamental biophysics and in medicine. Here, we review quantum metrology from this biological context, focusing on optical techniques due to their particular relevance for biological imaging, sensing, and stimulation. Our understanding of quantum mechanics has already enabled important applications in biology, including positron emission tomography (PET) with entangled photons, magnetic resonance imaging (MRI) using nuclear magnetic resonance, and bio-magnetic imaging with superconducting quantum interference devices (SQUIDs). In quantum metrology an even greater range of applications arise from the ability to not just understand, but to engineer, coherence and correlations at the quantum level. In the past few years, quite dramatic progress has been seen in applying these ideas into biological systems. Capabilities that have been demonstrated include enhanced sensitivity and resolution, immunity to imaging artefacts and technical noise, and characterization of the biological response to light at the single-photon level. New quantum measurement techniques offer even greater promise, raising the prospect for improved multi-photon microscopy and magnetic imaging, among many other possible applications. Realization of this potential will require cross-disciplinary input from researchers in both biology and quantum physics. In this review we seek to communicate the developments of quantum metrology in a way that is accessible to biologists and biophysicists, while providing sufficient details to allow the interested reader to obtain a solid understanding of the field. We further seek to introduce quantum physicists to some of the central challenges of optical measurements in biological science. We hope that this will aid in bridging the communication gap that exists

  3. Nonlinear metrology with a quantum interface

    OpenAIRE

    Napolitano, M.; Mitchell, M. W.

    2009-01-01

    We describe nonlinear quantum atom-light interfaces and nonlinear quantum metrology in the collective continuous variable formalism. We develop a nonlinear effective Hamiltonian in terms of spin and polarization collective variables and show that model Hamiltonians of interest for nonlinear quantum metrology can be produced in $^{87}$Rb ensembles. With these Hamiltonians, metrologically relevant atomic properties, e.g. the collective spin, can be measured better than the "Heisenberg limit" $\\...

  4. Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V; Barber, Samuel; Domning, Edward E.; Kirschman, Jonathan L.; Morrison, Gregory Y.; Smith, Brian V; Siewert, Frank; Zeschke, Thomas; Geckeler, Ralf; Just, Andreas

    2009-09-11

    A new low budget slope measuring instrument, the Developmental Long Trace Profiler (DLTP), was recently brought to operation at the ALS Optical Metrology Laboratory. The design, instrumental control and data acquisition system, initial alignment and calibration procedures, as well as the developed experimental precautions and procedures are described in detail. The capability of the DLTP to achieve sub-microradian surface slope metrology is verified via cross-comparison measurements with other high performance slope measuring instruments when measuring the same high quality test optics. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.

  5. An International Comparison of Absolute Radiant Power Measurement Capabilities

    OpenAIRE

    Thomas, Douglas B.

    1990-01-01

    We report the results of an intercomparison of monochromatic radiant power measurement capabilities recently completed by 11 national laboratories. The intercomparison radiometers, distributed in pairs, included an amplifier with six decades of precision gain and one of two types of silicon photodiode (pn or np-type construction). Eleven of the laboratories measured the absolute responsivity of the radiometers at 633 nm and nine at 488 nm. The standard deviation of the overall difference was ...

  6. A Quantitative Approach for Measuring Technological Forecasting Capability

    OpenAIRE

    Ayhan, Mustafa Batuhan; Oztemel, Ercan

    2013-01-01

    Successful technological forecasting is important to invest scarce funds to emerging technologies. A generic model to measure the success of forecasting overall technological changes is introduced in this paper, called degree of Technological Forecasting Capability. It measures the success rate of forecasts in manufacturing processes based on four important aspects of a manufacturing system; Flow Time, Quantity/Day, Scrap Ratio, and New Investment Revenue. The proposed approach has been verif...

  7. Opening the black box: measuring hospital information technology capability.

    Science.gov (United States)

    Burke, Darrell E; Menachemi, Nir

    2004-01-01

    Recently, health care investment in information technology (IT) has experienced a significant increase. Paralleling this increase has been an increase in IT capabilities. Despite the interest in and promises of IT in the health care setting, there is a paucity of empirical research that has attempted to define an organizational measure of IT capability. The dearth of research has contributed to the traditional belief that IT is perceived as a "black box," whereby organizational resources enter the box as "inputs" and are somehow transformed into positive outcomes for an organization. However, for positive outcomes to be realized, these outcomes must be measurable. This research uses a stakeholder perspective to develop a theoretically specified measure of IT capability. A latent construct, IT munificence, is proposed using tenets from diffusion of innovation theory and strategic contingency theory. The construct is tested using a sample of 1,545 acute care hospitals located in the United States. IT munificence fits the study data well, supporting the hypothesis that IT munificence represents a strategy of hospital IT capability.

  8. Metrology - Beyond the Calibration Lab

    Science.gov (United States)

    Mimbs, Scott M.

    2008-01-01

    We rely on data from measurements every day; a gas-pump, a speedometer, and a supermarket weight scale are just three examples of measurements we use to make decisions. We generally accept the data from these measurements as "valid." One reason we can accept the data is the "legal metrology" requirements established and regulated by the government in matters of commerce. The measurement data used by NASA, other government agencies, and industry can be critical to decisions which affect everything from economic viability, to mission success, to the security of the nation. Measurement data can even affect life and death decisions. Metrology requirements must adequately provide for risks associated with these decisions. To do this, metrology must be integrated into all aspects of an industry including research, design, testing, and product acceptance. Metrology, the science of measurement, has traditionally focused on the calibration of instruments, and although instrument calibration is vital, it is only a part of the process that assures quality in measurement data. For example, measurements made in research can influence the fundamental premises that establish the design parameters, which then flow down to the manufacturing processes, and eventually impact the final product. Because a breakdown can occur anywhere within this cycle, measurement quality assurance has to be integrated into every part of the life-cycle process starting with the basic research and ending with the final product inspection process. The purpose of this paper is to discuss the role of metrology in the various phases of a product's life-cycle. For simplicity, the cycle will be divided in four broad phases, with discussions centering on metrology within NASA. .

  9. Comparison of ATLAS Tilecal MODULE No 8 high-precision metrology measurement results obtained by laser (JINR) and photogrammetric (CERN) methods

    CERN Document Server

    Batusov, V; Gayde, J C; Khubua, J I; Lasseur, C; Lyablin, M V; Miralles-Verge, L; Nessi, Marzio; Rusakovitch, N A; Sissakian, A N; Topilin, N D

    2002-01-01

    The high-precision assembly of large experimental set-ups is of a principal necessity for the successful execution of the forthcoming LHC research programme in the TeV-beams. The creation of an adequate survey and control metrology method is an essential part of the detector construction scenario. This work contains the dimension measurement data for ATLAS hadron calorimeter MODULE No. 8 (6 m, 22 tons) which were obtained by laser and by photogrammetry methods. The comparative data analysis demonstrates the measurements agreement within +or-70 mu m. It means, these two clearly independent methods can be combined and lead to the rise of a new-generation engineering culture: high-precision metrology when precision assembling of large scale massive objects. (3 refs).

  10. NASA ATP Force Measurement Technology Capability Strategic Plan

    Science.gov (United States)

    Rhew, Ray D.

    2008-01-01

    The Aeronautics Test Program (ATP) within the National Aeronautics and Space Administration (NASA) Aeronautics Research Mission Directorate (ARMD) initiated a strategic planning effort to re-vitalize the force measurement capability within NASA. The team responsible for developing the plan included members from three NASA Centers (Langley, Ames and Glenn) as well as members from the Air Force s Arnold Engineering and Development Center (AEDC). After visiting and discussing force measurement needs and current capabilities at each participating facility as well as selected force measurement companies, a strategic plan was developed to guide future NASA investments. This paper will provide the details of the strategic plan and include asset management, organization and technology research and development investment priorities as well as efforts to date.

  11. Measuring the In-Process Figure, Final Prescription, and System Alignment of Large Optics and Segmented Mirrors Using Lidar Metrology

    Science.gov (United States)

    Ohl, Raymond; Slotwinski, Anthony; Eegholm, Bente; Saif, Babak

    2011-01-01

    The fabrication of large optics is traditionally a slow process, and fabrication capability is often limited by measurement capability. W hile techniques exist to measure mirror figure with nanometer precis ion, measurements of large-mirror prescription are typically limited to submillimeter accuracy. Using a lidar instrument enables one to measure the optical surface rough figure and prescription in virtuall y all phases of fabrication without moving the mirror from its polis hing setup. This technology improves the uncertainty of mirror presc ription measurement to the micron-regime.

  12. Extension of the Measurement Capabilities of the Quadrupole Resonator

    CERN Document Server

    Junginger, Tobias; Welsch, Carsten

    2012-01-01

    The Quadrupole Resonator, designed to measure the surface resistance of superconducting samples at 400 MHz has been refurbished. The accuracy of its RF-DC compensation measurement technique is tested by an independent method. It is shown that the device enables also measurements at 800 and 1200 MHz and is capable to probe the critical RF magnetic field. The electric and magnetic field configuration of the Quadrupole Resonator are dependent on the excited mode. It is shown how this can be used to distinguish between electric and magnetic losses.

  13. Pico meter metrology for the GAIA mission

    NARCIS (Netherlands)

    Meijer, E.A.; Nijenhuis, J.N.; Vink, R.J.P.; Kamphues, F.G.; Gielesen, W.L.M.; Coatantiec, C.

    2009-01-01

    To measure the relative motions of GAIA's telescopes, the angle between the telescopes is monitored by an all Silicon Carbide Basic Angle Monitoring subsystem (BAM OMA). TNO is developing this metrology system. The stability requirements for this metrology system go into the pico meter and pico radi

  14. Progress on FP13 Total Cross Section Measurements Capability

    Energy Technology Data Exchange (ETDEWEB)

    Ullmann, John Leonard [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Couture, Aaron Joseph [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Koehler, Paul E. [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Mocko, Michal [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Mosby, Shea Morgan [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Wender, Stephen Arthur [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2016-09-26

    An accurate knowledge of the neutron capture cross section is important for many applications. Experimental measurements are important since theoretical calculations of capture have been notoriously difficult, with the ratio of measured to calculated cross sections often a factor of 2 or more in the 10 keV to 1 MeV region. However, a direct measurement of capture cannot be made on many interesting radioactive nuclides because of their short half-life or backgrounds caused by their nuclear decay. On the other hand, neutron transmission measurements of the total cross section are feasible for a wide range of radioactive nuclides since the detectors are far from the sample, and often are less sensitive to decay radiation. The parameters extracted from a total cross section measurement, which include the average resonance spacing, the neutron strength function, and the average total radiation width, (Γγ), provide tight constraints on the calculation of the capture cross section, and when applied produce much more accurate results. These measurements can be made using the intense epithermal neutron flux at the Lujan Center on relatively small quantities of target material. It was the purpose of this project to investigate and develop the capability to make these measurements. A great deal of progress was made towards establishing this capability during 2016, including setting up the flight path and obtaining preliminary results, but more work remains to be done.

  15. Heterodyne Interferometer Angle Metrology

    Science.gov (United States)

    Hahn, Inseob; Weilert, Mark A.; Wang, Xu; Goullioud, Renaud

    2010-01-01

    A compact, high-resolution angle measurement instrument has been developed that is based on a heterodyne interferometer. The common-path heterodyne interferometer metrology is used to measure displacements of a reflective target surface. In the interferometer setup, an optical mask is used to sample the measurement laser beam reflecting back from a target surface. Angular rotations, around two orthogonal axes in a plane perpendicular to the measurement- beam propagation direction, are determined simultaneously from the relative displacement measurement of the target surface. The device is used in a tracking telescope system where pitch and yaw measurements of a flat mirror were simultaneously performed with a sensitivity of 0.1 nrad, per second, and a measuring range of 0.15 mrad at a working distance of an order of a meter. The nonlinearity of the device is also measured less than one percent over the measurement range.

  16. Metrological Reliability of Medical Devices

    Science.gov (United States)

    Costa Monteiro, E.; Leon, L. F.

    2015-02-01

    The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

  17. Celtiberian metrology and its romanization

    Directory of Open Access Journals (Sweden)

    Leonard A. CURCHIN

    2013-05-01

    Full Text Available Celtiberian metrology has scarcely been investigated until now, with the exception of coin weights. On the basis of measurements of pre-Roman mud bricks, a Celtiberian foot of 24 cm is proposed. With regard to weights, we can accept a module of 9 g for silver jewelry and some bronze coins; however, loom weights do not conform to any metrological system. Over time, Roman measures of length (as indicated by the dimensions of bricks, tiles and architectural monuments and weight were adopted.

  18. APPLICATION OF VISION METROLOGY TO IN-ORBIT MEASUREMENT OF LARGE REFLECTOR ONBOARD COMMUNICATION SATELLITE FOR NEXT GENERATION MOBILE SATELLITE COMMUNICATION

    Directory of Open Access Journals (Sweden)

    M. Akioka

    2016-06-01

    Full Text Available Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1 Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order

  19. Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

    Science.gov (United States)

    Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

    2016-06-01

    Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial

  20. Dimensional micro and nano metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; da Costa Carneiro, Kim; Haitjema, Han

    2006-01-01

    The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer these chal......The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer...... these challenges. The developments have to include new measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration. The current paper describes issues and challenges in dimensional micro and nano metrology by reviewing typical measurement tasks and available...

  1. Mask Design for the Space Interferometry Mission Internal Metrology

    Science.gov (United States)

    Marx, David; Zhao, Feng; Korechoff, Robert

    2005-01-01

    This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

  2. Nuclear Technology. Course 27: Metrology. Module 27-4, Angle Measurement Instruments, Optical Projections and Surface Texture Gages.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This fourth in a series of eight modules for a course titled Metrology describes the universal bevel protractor and the sine bar, the engineering microscope and optical projector, and several types of surface texture gages. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3)…

  3. Foundations of Metrology: Important Early Works on Weights and Measures in the Library of the National Bureau of Standards.

    Science.gov (United States)

    Terner, Janet R.

    The purpose of this project was to survey the National Bureau of Standards library holdings of pre-1900 works on metrology and from these, to assemble a special collection of historically important documents. The 265 imprints selected for the collection are listed in this report. Each entry includes the main author, title, imprint, and collation…

  4. Non-contact in vivo measurement of ocular microtremor using laser speckle correlation metrology.

    Science.gov (United States)

    Kenny, E; Coakley, D; Boyle, G

    2014-07-01

    Ocular microtremor (OMT) is a small involuntary eye movement present in all subjects. In this paper we present the results of in vivo OMT measurement using a novel non-contact laser speckle technique. OMT signals have not previously been measured from the sclera using this laser speckle correlation technique. To verify the system's ability to record eye movements, it is first tested using a large angle eye rotation. Next, the system is tested with a group of 20 subjects and OMT parameters are extracted. The results of OMT measurements gave a mean frequency of 78 ± 3.86 Hz and peak-to-peak amplitude of 21.42 ± 7.01 µrad, these values are consistent with known values from eye-contacting methods.

  5. Development of ballistics identification—from image comparison to topography measurement in surface metrology

    Science.gov (United States)

    Song, J.; Chu, W.; Vorburger, T. V.; Thompson, R.; Renegar, T. B.; Zheng, A.; Yen, J.; Silver, R.; Ols, M.

    2012-05-01

    Fired bullets and ejected cartridge cases have unique ballistics signatures left by the firearm. By analyzing the ballistics signatures, forensic examiners can trace these bullets and cartridge cases to the firearm used in a crime scene. Current automated ballistics identification systems are primarily based on image comparisons using optical microscopy. The correlation accuracy depends on image quality which is largely affected by lighting conditions. Because ballistics signatures are geometrical micro-topographies by nature, direct measurement and correlation of the surface topography is being investigated for ballistics identification. A Two-dimensional and Three-dimensional Topography Measurement and Correlation System was developed at the National Institute of Standards and Technology for certification of Standard Reference Material 2460/2461 bullets and cartridge cases. Based on this system, a prototype system for bullet signature measurement and correlation has been developed for bullet signature identifications, and has demonstrated superior correlation results.

  6. Metrology Optical Power Budgeting in SIM Using Statistical Analysis Techniques

    Science.gov (United States)

    Kuan, Gary M

    2008-01-01

    The Space Interferometry Mission (SIM) is a space-based stellar interferometry instrument, consisting of up to three interferometers, which will be capable of micro-arc second resolution. Alignment knowledge of the three interferometer baselines requires a three-dimensional, 14-leg truss with each leg being monitored by an external metrology gauge. In addition, each of the three interferometers requires an internal metrology gauge to monitor the optical path length differences between the two sides. Both external and internal metrology gauges are interferometry based, operating at a wavelength of 1319 nanometers. Each gauge has fiber inputs delivering measurement and local oscillator (LO) power, split into probe-LO and reference-LO beam pairs. These beams experience power loss due to a variety of mechanisms including, but not restricted to, design efficiency, material attenuation, element misalignment, diffraction, and coupling efficiency. Since the attenuation due to these sources may degrade over time, an accounting of the range of expected attenuation is needed so an optical power margin can be book kept. A method of statistical optical power analysis and budgeting, based on a technique developed for deep space RF telecommunications, is described in this paper and provides a numerical confidence level for having sufficient optical power relative to mission metrology performance requirements.

  7. Resolving and measuring diffusion in complex interfaces: Exploring new capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Alam, Todd M. [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

    2015-09-01

    This exploratory LDRD targeted the use of a new high resolution spectroscopic diffusion capabilities developed at Sandia to resolve transport processes at interfaces in heterogeneous polymer materials. In particular, the combination of high resolution magic angle spinning (HRMAS) nuclear magnetic resonance (NMR) spectroscopy with pulsed field gradient (PFG) diffusion experiments were used to directly explore interface diffusion within heterogeneous polymer composites, including measuring diffusion for individual chemical species in multi-component mixtures. Several different types of heterogeneous polymer systems were studied using these HRMAS NMR diffusion capabilities to probe the resolution limitations, determine the spatial length scales involved, and explore the general applicability to specific heterogeneous systems. The investigations pursued included a) the direct measurement of the diffusion for poly(dimethyl siloxane) polymer (PDMS) on nano-porous materials, b) measurement of penetrant diffusion in additive manufactures (3D printed) processed PDMS composites, and c) the measurement of diffusion in swollen polymers/penetrant mixtures within nano-confined aluminum oxide membranes. The NMR diffusion results obtained were encouraging and allowed for an improved understanding of diffusion and transport processes at the molecular level, while at the same time demonstrating that the spatial heterogeneity that can be resolved using HRMAS NMR PFG diffusion experiment must be larger than ~μm length scales, expect for polymer transport within nanoporous carbons where additional chemical resolution improves the resolvable heterogeneous length scale to hundreds of nm.

  8. Reference materials produced for a European metrological research project focussing on measurements of NORM.

    Science.gov (United States)

    Larijani, C; Pearce, A K; Regan, P H; Russell, B C; Jerome, S M; Crespo, M T; de Felice, P; Lutter, G; Maringer, F; Mazánová, M

    2017-08-01

    Reliable measurement of Naturally Occurring Radioactive Materials is of significance in order to comply with environmental regulations and for radiological protection purposes. This paper discusses the standardisation of three reference materials, namely sand, tuff and TiO2 to serve as quality control materials for traceability, method validation and instrument calibration. The sample preparation, material characterization via γ, α and Inductively Coupled Plasma Mass Spectrometry (ICP-MS) and the assignment of values for both the 4n (Thorium) and 4n+2 (Uranium) decay series are described. Crown Copyright © 2017. Published by Elsevier Ltd. All rights reserved.

  9. Metrological traceability in education: A practical online system for measuring and managing middle school mathematics instruction

    Science.gov (United States)

    Torres Irribarra, D.; Freund, R.; Fisher, W.; Wilson, M.

    2015-02-01

    Computer-based, online assessments modelled, designed, and evaluated for adaptively administered invariant measurement are uniquely suited to defining and maintaining traceability to standardized units in education. An assessment of this kind is embedded in the Assessing Data Modeling and Statistical Reasoning (ADM) middle school mathematics curriculum. Diagnostic information about middle school students' learning of statistics and modeling is provided via computer-based formative assessments for seven constructs that comprise a learning progression for statistics and modeling from late elementary through the middle school grades. The seven constructs are: Data Display, Meta-Representational Competence, Conceptions of Statistics, Chance, Modeling Variability, Theory of Measurement, and Informal Inference. The end product is a web-delivered system built with Ruby on Rails for use by curriculum development teams working with classroom teachers in designing, developing, and delivering formative assessments. The online accessible system allows teachers to accurately diagnose students' unique comprehension and learning needs in a common language of real-time assessment, logging, analysis, feedback, and reporting.

  10. Oscillator metrology with software defined radio

    CERN Document Server

    Sherman, Jeff A

    2016-01-01

    Analog electrical elements such as mixers, filters, transfer oscillators, isolating buffers, dividers, and even transmission lines contribute technical noise and unwanted environmental coupling in time and frequency measurements. Software defined radio (SDR) techniques replace many of these analog components with digital signal processing (DSP) on rapidly sampled signals. We demonstrate that, generically, commercially available multi-channel SDRs are capable of time and frequency metrology, outperforming purpose-built devices by as much as an order-of-magnitude. For example, for signals at 10 MHz and 6 GHz, we observe SDR time deviation noise floors of about 20 fs and 1 fs, respectively, in under 10 ms of averaging. Examining the other complex signal component, we find a relative amplitude measurement instability of 3e-7 at 5 MHz. We discuss the scalability of a SDR-based system for simultaneous measurement of many clocks. SDR's frequency agility allows for comparison of oscillators at widely different freque...

  11. Measuring Capability for Healthy Diet and Physical Activity

    Science.gov (United States)

    Ferrer, Robert L.; Cruz, Inez; Burge, Sandra; Bayles, Bryan; Castilla, Martha I.

    2014-01-01

    PURPOSE Patterns of diet and physical activity, major drivers of morbidity and mortality, are contingent on people’s feasible opportunities to pursue healthy behaviors. Our objective for this mixed methods study was to develop measures of feasible opportunities for diet and activity. METHODS The Capability Approach framework for evaluating people’s real freedoms to pursue their values guided the research. A community-based participatory model was applied to conduct focus groups of adults with obesity or diabetes mellitus from an economically disadvantaged Latino community. Focus group themes were developed into survey items that assess how individual circumstances and neighborhood contexts influence opportunities for diet and activity. The prevalence of different influences was explored in a sample of 300 patients from a primary care safety net clinic. Scales measuring different aspects of opportunity were created through principal components analysis. RESULTS Availability, convenience, safety, cost of food, and activity resources interact with individual circumstances, such as illness, depression, family and nonfamily supports, and scope of personal agency, to shape practical opportunities. Multiple vulnerabilities in availability of resources and moderators of resource use commonly occur together, intensifying challenges and creating difficult trade-offs. Only one-half of participants reported that physicians understood their difficulties pursuing activity, and just one-third for diet. CONCLUSIONS Our results suggest that practical opportunities for healthy behavior can be measured as a primary target for clinical and public health assessment and intervention. The Capability Approach holds promise as a framework for developing interventions responsive to both personal and environmental determinants. PMID:24445103

  12. Metrology for graphene and 2D materials

    Science.gov (United States)

    Pollard, Andrew J.

    2016-09-01

    The application of graphene, a one atom-thick honeycomb lattice of carbon atoms with superlative properties, such as electrical conductivity, thermal conductivity and strength, has already shown that it can be used to benefit metrology itself as a new quantum standard for resistance. However, there are many application areas where graphene and other 2D materials, such as molybdenum disulphide (MoS2) and hexagonal boron nitride (h-BN), may be disruptive, areas such as flexible electronics, nanocomposites, sensing and energy storage. Applying metrology to the area of graphene is now critical to enable the new, emerging global graphene commercial world and bridge the gap between academia and industry. Measurement capabilities and expertise in a wide range of scientific areas are required to address this challenge. The combined and complementary approach of varied characterisation methods for structural, chemical, electrical and other properties, will allow the real-world issues of commercialising graphene and other 2D materials to be addressed. Here, examples of metrology challenges that have been overcome through a multi-technique or new approach are discussed. Firstly, the structural characterisation of defects in both graphene and MoS2 via Raman spectroscopy is described, and how nanoscale mapping of vacancy defects in graphene is also possible using tip-enhanced Raman spectroscopy (TERS). Furthermore, the chemical characterisation and removal of polymer residue on chemical vapour deposition (CVD) grown graphene via secondary ion mass spectrometry (SIMS) is detailed, as well as the chemical characterisation of iron films used to grow large domain single-layer h-BN through CVD growth, revealing how contamination of the substrate itself plays a role in the resulting h-BN layer. In addition, the role of international standardisation in this area is described, outlining the current work ongoing in both the International Organization of Standardization (ISO) and the

  13. Optical vortex metrology: Are phase singularities foes or friends in optical metrology?

    DEFF Research Database (Denmark)

    Takeda, M.; Wang, W.; Hanson, Steen Grüner;

    2008-01-01

    We raise an issue whether phase singularities are foes or friends in optical metrology, and give an answer by introducing the principle and applications of a new technique which we recently proposed for displacement and flow measurements. The technique is called optical vortex metrology because...

  14. Measurement Capabilities of the DOE ARM Aerial Facility

    Science.gov (United States)

    Schmid, B.; Tomlinson, J. M.; Hubbe, J.; Comstock, J. M.; Kluzek, C. D.; Chand, D.; Pekour, M. S.

    2012-12-01

    The Department of Energy Atmospheric Radiation Measurement (ARM) Program is a climate research user facility operating stationary ground sites in three important climatic regimes that provide long-term measurements of climate relevant properties. ARM also operates mobile ground- and ship-based facilities to conduct shorter field campaigns (6-12 months) to investigate understudied climate regimes around the globe. Finally, airborne observations by ARM's Aerial Facility (AAF) enhance the surface-based ARM measurements by providing high-resolution in situ measurements for process understanding, retrieval algorithm development, and model evaluation that is not possible using ground-based techniques. AAF started out in 2007 as a "virtual hangar" with no dedicated aircraft and only a small number of instruments owned by ARM. In this mode, AAF successfully carried out several missions contracting with organizations and investigators who provided their research aircraft and instrumentation. In 2009, the Battelle owned G-1 aircraft was included in the ARM facility. The G-1 is a large twin turboprop aircraft, capable of measurements up to altitudes of 7.5 km and a range of 2,800 kilometers. Furthermore the American Recovery and Reinvestment Act of 2009 provided funding for the procurement of seventeen new instruments to be used aboard the G-1 and other AAF virtual-hangar aircraft. AAF now executes missions in the virtual- and real-hangar mode producing freely available datasets for studying aerosol, cloud, and radiative processes in the atmosphere. AAF is also heavily engaged in the maturation and testing of newly developed airborne sensors to help foster the next generation of airborne instruments. In the presentation we will showcase science applications based on measurements from recent field campaigns such as CARES, CALWATER and TCAP.

  15. Improvements to TITAN's mass measurement and decay spectroscopy capabilities

    Science.gov (United States)

    Lascar, D.; Kwiatkowski, A. A.; Alanssari, M.; Chowdhury, U.; Even, J.; Finlay, A.; Gallant, A. T.; Good, M.; Klawitter, R.; Kootte, B.; Li, T.; Leach, K. G.; Lennarz, A.; Leistenschneider, E.; Mayer, A. J.; Schultz, B. E.; Schupp, R.; Short, D. A.; Andreoiu, C.; Dilling, J.; Gwinner, G.

    2016-06-01

    The study of nuclei farther from the valley of β -stability than ever before goes hand-in-hand with shorter-lived nuclei produced in smaller abundances than their less exotic counterparts. The measurement, to high precision, of nuclear masses therefore requires innovations in technique in order to keep up. TRIUMF's Ion Trap for Atomic and Nuclear science (TITAN) facility deploys three ion traps, with a fourth in the commissioning phase, to perform and support Penning trap mass spectrometry and in-trap decay spectroscopy on some of the shortest-lived nuclei ever studied. We report on recent advances and updates to the TITAN facility since the 2012 EMIS conference. TITAN's charge breeding capabilities have been improved and in-trap decay spectroscopy can be performed in TITAN's Electron Beam Ion Trap (EBIT). Higher charge states can improve the precision of mass measurements, reduce the beam-time requirements for a given measurement, improve beam purity, and open the door to access isotopes not available from the ISOL method via in-trap decay and recapture. This was recently demonstrated during TITAN's mass measurement of 30 Al. The EBIT's decay spectroscopy setup was commissioned with a successful branching ratio and half-life measurement of 124 Cs. Charge breeding in the EBIT increases the energy spread of the ion bunch sent to the Penning trap for mass measurement, so a new Cooler PEnning Trap (CPET), which aims to cool highly charged ions with an electron plasma, is undergoing offline commissioning. Already CPET has demonstrated the trapping and self-cooling of a room-temperature electron plasma that was stored for several minutes. A new detector has been installed inside the CPET magnetic field which will allow for in-magnet charged particle detection.

  16. Neutron source capability assessment for cumulative fission yields measurements

    Energy Technology Data Exchange (ETDEWEB)

    Descalle, M A; Dekin, W; Kenneally, J

    2011-04-06

    A recent analysis of high-quality cumulative fission yields data for Pu-239 published in the peer-reviewed literature showed that the quoted experimental uncertainties do not allow a clear statement on how the fission yields vary as a function of energy. [Prussin2009] To make such a statement requires a set of experiments with well 'controlled' and understood sources of experimental errors to reduce uncertainties as low as possible, ideally in the 1 to 2% range. The Inter Laboratory Working Group (ILWOG) determined that Directed Stockpile Work (DSW) would benefit from an experimental program with the stated goal to reduce the measurement uncertainties significantly in order to make a definitive statement of the relationship of energy dependence to the cumulative fission yields. Following recent discussions between Lawrence Livermore National Laboratory (LLNL) and Los Alamos National Laboratory (LANL), there is a renewed interest in developing a concerted experimental program to measure fission yields in a neutron energy range from thermal energy (0.025 eV) to 14 MeV with an emphasis on discrete energies from 0.5 to 4 MeV. Ideally, fission yields would be measured at single energies, however, in practice there are only 'quasi-monoenergetic' neutrons sources of finite width. This report outlines a capability assessment as of June 2011 of available neutron sources that could be used as part of a concerted experimental program to measure cumulative fission yields. In a framework of international collaborations, capabilities available in the United States, at the Atomic Weapons Establishment (AWE) in the United Kingdom and at the Commissariat Energie Atomique (CEA) in France are listed. There is a need to develop an experimental program that will reduce the measurement uncertainties significantly in order to make a definitive statement of the relationship of energy dependence to the cumulative fission yields. Fission and monoenergetic neutron sources

  17. Improvements to TITAN's Mass Measurement and Decay Spectroscopy Capabilities

    CERN Document Server

    Lascar, D; Chowdhury, U; Finlay, A; Gallant, A T; Good, M; Klawitter, R; Kootte, B; Leach, K G; Lennarz, A; Leistenschneider, E; Schultz, B E; Schupp, R; Short, D A; Andreoiu, C; Dilling, J; Gwinner, G

    2015-01-01

    The study of nuclei farther from the valley of $\\beta$-stability goes hand-in-hand with shorter-lived nuclei produced in smaller abundances than their more stable counterparts. The measurement, to high precision, of nuclear masses therefore requires innovations in technique in order to keep up. TRIUMF's Ion Trap for Atomic and Nuclear science (TITAN) facility deploys three ion traps, with a fourth in the commissioning phase, to perform and support Penning trap mass spectrometry and in-trap decay spectroscopy on some of the shortest-lived nuclei ever studied. We report on recent advances and updates to the TITAN facility since the 2012 EMIS Conference. TITAN's charge breeding capabilities have been improved and in-trap decay spectroscopy can be performed in TITAN's electron beam ion trap (EBIT). Higher charge states can improve the precision of mass measurements, reduce the beam-time requirements for a given measurement, improve beam purity and opens the door to access, via in-trap decay and recapture, isotope...

  18. Advances in Quantum Metrology

    CERN Document Server

    Giovannetti, Vittorio; Maccone, Lorenzo

    2011-01-01

    In classical estimation theory, the central limit theorem implies that the statistical error in a measurement outcome can be reduced by an amount proportional to n^(-1/2) by repeating the measures n times and then averaging. Using quantum effects, such as entanglement, it is often possible to do better, decreasing the error by an amount proportional to 1/n. Quantum metrology is the study of those quantum techniques that allow one to gain advantages over purely classical approaches. In this review, we analyze some of the most promising recent developments in this research field. Specifically, we deal with the developments of the theory and point out some of the new experiments. Then we look at one of the main new trends of the field, the analysis of how the theory must take into account the presence of noise and experimental imperfections.

  19. XPS-XRF hybrid metrology enabling FDSOI process

    Science.gov (United States)

    Hossain, Mainul; Subramanian, Ganesh; Triyoso, Dina; Wahl, Jeremy; Mcardle, Timothy; Vaid, Alok; Bello, A. F.; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Pois, Heath; Wang, Ying; Larson, Tom

    2016-03-01

    Planar fully-depleted silicon-on-insulator (FDSOI) technology potentially offers comparable transistor performance as FinFETs. pFET FDOSI devices are based on a silicon germanium (cSiGe) layer on top of a buried oxide (BOX). Ndoped interfacial layer (IL), high-k (HfO2) layer and the metal gate stacks are then successively built on top of the SiGe layer. In-line metrology is critical in precisely monitoring the thickness and composition of the gate stack and associated underlying layers in order to achieve desired process control. However, any single in-line metrology technique is insufficient to obtain the thickness of IL, high-k, cSiGe layers in addition to Ge% and N-dose in one single measurement. A hybrid approach is therefore needed that combines the capabilities of more than one measurement technique to extract multiple parameters in a given film stack. This paper will discuss the approaches, challenges, and results associated with the first-in-industry implementation of XPS-XRF hybrid metrology for simultaneous detection of high-k thickness, IL thickness, N-dose, cSiGe thickness and %Ge, all in one signal measurement on a FDSOI substrate in a manufacturing fab. Strong correlation to electrical data for one or more of these measured parameters will also be presented, establishing the reliability of this technique.

  20. Sensorized toys for measuring manipulation capabilities of infants at home.

    Science.gov (United States)

    Passetti, Giovanni; Cecchi, Francesca; Baldoli, Ilaria; Sgandurra, Giuseppina; Beani, Elena; Cioni, Giovanni; Laschi, Cecilia; Dario, Paolo

    2015-01-01

    Preterm infants, i.e. babies born after a gestation period shorter than 37 weeks, spend less time exploring objects. The quantitative measurement of grasping actions and forces in infants can give insights on their typical or atypical motor development. The aim of this work was to test a new tool, a kit of sensorized toys, to longitudinally measure, monitor and promote preterm infants manipulation capabilities with a purposive training in an ecological environment. This study presents preliminary analysis of grasping activity. Three preterm infants performed 4 weeks of daily training at home. Sensorized toys with embedded pressure sensors were used as part of the training to allow quantitative analysis of grasping (pressure and acceleration applied to toys while playing). Each toy was placed on the midline, while the infant was in supine position. Preliminary data show differences in the grasping parameters in relation to infants age and the performed daily training. Ongoing clinical trial will allow a full validation of this new tool for promoting object exploration in preterm infants.

  1. Accurate in-line CD metrology for nanometer semiconductor manufacturing

    Science.gov (United States)

    Perng, Baw-Ching; Shieh, Jyu-Horng; Jang, S.-M.; Liang, M.-S.; Huang, Renee; Chen, Li-Chien; Hwang, Ruey-Lian; Hsu, Joe; Fong, David

    2006-03-01

    The need for absolute accuracy is increasing as semiconductor-manufacturing technologies advance to sub-65nm nodes, since device sizes are reducing to sub-50nm but offsets ranging from 5nm to 20nm are often encountered. While TEM is well-recognized as the most accurate CD metrology, direct comparison between the TEM data and in-line CD data might be misleading sometimes due to different statistical sampling and interferences from sidewall roughness. In this work we explore the capability of CD-AFM as an accurate in-line CD reference metrology. Being a member of scanning profiling metrology, CD-AFM has the advantages of avoiding e-beam damage and minimum sample damage induced CD changes, in addition to the capability of more statistical sampling than typical cross section metrologies. While AFM has already gained its reputation on the accuracy of depth measurement, not much data was reported on the accuracy of CD-AFM for CD measurement. Our main focus here is to prove the accuracy of CD-AFM and show its measuring capability for semiconductor related materials and patterns. In addition to the typical precision check, we spent an intensive effort on examining the bias performance of this CD metrology, which is defined as the difference between CD-AFM data and the best-known CD value of the prepared samples. We first examine line edge roughness (LER) behavior for line patterns of various materials, including polysilicon, photoresist, and a porous low k material. Based on the LER characteristics of each patterning, a method is proposed to reduce its influence on CD measurement. Application of our method to a VLSI nanoCD standard is then performed, and agreement of less than 1nm bias is achieved between the CD-AFM data and the standard's value. With very careful sample preparations and TEM tool calibration, we also obtained excellent correlation between CD-AFM and TEM for poly-CDs ranging from 70nm to 400nm. CD measurements of poly ADI and low k trenches are also

  2. Metrology in Pharmaceutical Industry - A Case Study

    Science.gov (United States)

    Yuvamoto, Priscila D.; Fermam, Ricardo K. S.; Nascimento, Elizabeth S.

    2016-07-01

    Metrology is recognized by improving production process, increasing the productivity, giving more reliability to the measurements and consequently, it impacts in the economy of a country. Pharmaceutical area developed GMP (Good Manufacture Practice) requeriments, with no introduction of metrological concepts. However, due to Nanomedicines, it is expected this approach and the consequent positive results. The aim of this work is to verify the level of metrology implementation in a Brazilian pharmaceutical industry, using a case study. The purpose is a better mutual comprehension by both areas, acting together and governmental support to robustness of Brazilian pharmaceutical area.

  3. Metrological multispherical freeform artifact

    Science.gov (United States)

    Blobel, Gernot; Wiegmann, Axel; Siepmann, Jens; Schulz, Michael

    2016-07-01

    Precisely known artifacts are required to characterize the accuracy of asphere and freeform measuring instruments. To this end the best knowledge of the surface characteristics in conjunction with a low measurement uncertainty are necessary. Because this is a challenging task for typical freeform surfaces used in optical systems, the concept of "metrological" artifacts is introduced. We have developed a multispherical freeform artifact for performance tests of tactile touch probe and contact-free optical measuring systems. The measurement accuracy of the complete form and the deviation from calibrated spherical sections can thus be determined. The radius calibration of multiple spherical sections is performed with an extended radius measuring procedure by interferometry. Evaluated surface forms of different measuring methods and the radii determined can be compared to each other. In this study, a multispherical freeform specimen made of copper, with two differing radii, has been measured by two optical measuring methods, a full field measuring tilted-wave interferometer and a high accuracy cylinder coordinate measuring machine with an optical probe. The surface form measurements are evaluated and compared, and the radii determined are compared to the results of a radius measurement bench.

  4. Radon metrology

    Energy Technology Data Exchange (ETDEWEB)

    Naismith, S.; Howarth, C. [National Radiological Protection Board, Chilton (United Kingdom)

    1996-09-01

    NRPB carries out calibrations of various types of radon and radon decay product measurement systems for its own purposes and for laboratories throughout Europe. There are currently two radon calibration facilities at NRPB: a 43 m{sup 3} radon chamber and the Fast Radon Exposure Device (FRED), a sealed steel drum. The radon chamber is used for active radon detection systems and the calibration of large numbers of passive detectors. Fred has a high radon concentration and is used to calibrate small numbers of passive radon gas detectors in a short period. (Author).

  5. Mass metrology

    CERN Document Server

    Gupta, S V

    2012-01-01

    This book presents the practical aspects of mass measurements. Concepts of gravitational, inertial and conventional mass and details of the variation of acceleration of gravity are described. The Metric Convention and International Prototype Kilogram and BIPM standards are described. The effect of change of gravity on the indication of electronic balances is derived with respect of latitude, altitude and earth topography. The classification of weights by OIML is discussed. Maximum permissible errors in different categories of weights prescribed by national and international organizations are p

  6. Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique.

    Science.gov (United States)

    Wang, Hongchang; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal

    2015-07-01

    In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

  7. Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Hongchang, E-mail: hongchang.wang@diamond.ac.uk; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal [Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

    2015-06-06

    The two-dimensional slope error of an X-ray mirror has been retrieved by employing the speckle scanning technique, which will be valuable at synchrotron radiation facilities and in astronomical telescopes. In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

  8. Metrological control of instruments, equipment and measurement system for ultrasonic meters of flow; Controle metrologico de instrumentos, equipamentos e sistema de medicao para medidores ultra-sonicos de vazao

    Energy Technology Data Exchange (ETDEWEB)

    Palacios, Oscar de

    2004-07-01

    Following the actual tendency to obtaining greater precision in Natural Gas measurement, in the past few years the use of Ultrasonic Flow Meters as Custody Transfer applications has grown significantly. There are several units currently operating in Brazil. The legislation for model approval, measure system certification and periodical metrological control of the above mentioned equipment, is currently under elaboration final stage. It was placed under public inquire through the 'Portaria 037' of 2004 of INMETRO, which proposes the authorization to perform the Metrological control by the Operator, once it has a quality system implemented according NBR ISO 9001-2000 and/or ISO 17025. This paper describes the verification procedure adopted by most of ultrasonic meters manufacturers. It also describes the application of the procedure for create the 'Metrological Control System of the Measurement System' of a 12'' Ultrasonic Meter installed and operating, with 3 years operation's data. (author)

  9. Metrology and Energy Conservation

    Institute of Scientific and Technical Information of China (English)

    Xuan Xiang

    2006-01-01

    @@ May 20 is World Metrology Day and the theme of this year is "Metrology and Energy Conservation." Energy is not only a vital issue for China, but also for the world. In order to implement Proposal of the CPC Central Committee on the 11th Five-Year Program for National Economic and Social Development, the government bulletin of 5th Plenary Session of the 16th CPC Central Committee announced that "there shall be marked improvement on resource utilization; the energy consumption for unit GDP shall cut 20%, water consumption of unit industrial added value drop 30%... and the recycle ratio of industrial solid wastes shall raise by 60%." These are key targets of economic development during the 11th five-year program. To make full use of metrology for energy conservation and energy utilization, the competent metrology department of Chinese Goyernment advanced metrology program in light of China's energy status.

  10. Metrological Needs for Monitoring Aquatic Environments: From the Demonstration of Metrological Traceability to the Decision Making Process

    Science.gov (United States)

    Lardy-Fontan, Sophie; Guigues, Nathalie; Lalere, Béatrice; Vaslin-Reimann, Sophie

    2014-08-01

    In Europe, the implementation of the Water Framework Directive WFD, in 2001, marks a strong standpoint. In addition to its objectives of a return to good chemical and good ecological status by the year 2015, it fixes the achievement of trends over space and time. The new requirements that arise from the WFD put considerable financial pressure on water management authorities. Because the overall decision-making process relies most of the time on acquired data, it puts considerable pressures on the display of high quality biological as well as chemical environmental measurements. However, performing measurements implies that i) the demonstration of their metrological traceability ii) the evidence of their achievement thanks to accurate and sensitive analytical methods and iii) their statement with a reliable estimate of expanded uncertainty is thoroughly addressed. Moreover, the measurement representativeness, especially in highly dynamic environment, is of prime interest in a context where comparability over space and time is needed. As a consequence, considerable challenges are dwelt on metrologists with great emphasis on parameters that are under regulation. This paper will discuss a panorama of the unavoidable metrological questions that have to be addressed: from the definition of the measurand to the final estimation of uncertainty; from the initial performances demonstration of methods to the final demonstration of mastery and capabilities through inter comparison laboratories and reference materials. A focus will be made on upcoming alternative monitoring approaches that are seldom addressed from a metrological point of view.

  11. Electrical test prediction using hybrid metrology and machine learning

    Science.gov (United States)

    Breton, Mary; Chao, Robin; Muthinti, Gangadhara Raja; de la Peña, Abraham A.; Simon, Jacques; Cepler, Aron J.; Sendelbach, Matthew; Gaudiello, John; Emans, Susan; Shifrin, Michael; Etzioni, Yoav; Urenski, Ronen; Lee, Wei Ti

    2017-03-01

    Electrical test measurement in the back-end of line (BEOL) is crucial for wafer and die sorting as well as comparing intended process splits. Any in-line, nondestructive technique in the process flow to accurately predict these measurements can significantly improve mean-time-to-detect (MTTD) of defects and improve cycle times for yield and process learning. Measuring after BEOL metallization is commonly done for process control and learning, particularly with scatterometry (also called OCD (Optical Critical Dimension)), which can solve for multiple profile parameters such as metal line height or sidewall angle and does so within patterned regions. This gives scatterometry an advantage over inline microscopy-based techniques, which provide top-down information, since such techniques can be insensitive to sidewall variations hidden under the metal fill of the trench. But when faced with correlation to electrical test measurements that are specific to the BEOL processing, both techniques face the additional challenge of sampling. Microscopy-based techniques are sampling-limited by their small probe size, while scatterometry is traditionally limited (for microprocessors) to scribe targets that mimic device ground rules but are not necessarily designed to be electrically testable. A solution to this sampling challenge lies in a fast reference-based machine learning capability that allows for OCD measurement directly of the electrically-testable structures, even when they are not OCD-compatible. By incorporating such direct OCD measurements, correlation to, and therefore prediction of, resistance of BEOL electrical test structures is significantly improved. Improvements in prediction capability for multiple types of in-die electrically-testable device structures is demonstrated. To further improve the quality of the prediction of the electrical resistance measurements, hybrid metrology using the OCD measurements as well as X-ray metrology (XRF) is used. Hybrid metrology

  12. 3-D Microprobe Metrology

    Energy Technology Data Exchange (ETDEWEB)

    Swallow, Kevin

    2008-10-14

    This report documents the results of a project undertaken to develop an ultra-high-accuracy measurement capability, which is necessary to address a rising trend toward miniaturized mechanical products exhibiting dramatically reduced product tolerances. A significant improvement in measurement capability is therefore required to insure that a 4:1 ratio can be maintained between product tolerances and measurement uncertainty.

  13. The future of 2D metrology for display manufacturing

    Science.gov (United States)

    Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

    2016-10-01

    The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

  14. Flexible resources for quantum metrology

    Science.gov (United States)

    Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

    2017-06-01

    Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

  15. Lithography, metrology and nanomanufacturing.

    Science.gov (United States)

    Liddle, J Alexander; Gallatin, Gregg M

    2011-07-01

    Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be perfect. Assuring perfection requires expensive metrology. Top of the line logic sells for several hundred thousand dollars per square metre and, even though the required metrology is expensive, it is a small percentage of the overall manufacturing cost. The level of stability and control afforded by current lithography tools means that much of this metrology can be online and statistical. In contrast, many of the novel types of nanomanufacturing currently being developed will produce products worth only a few dollars per square metre. To be cost effective, the required metrology must cost proportionately less. Fortunately many of these nanofabrication techniques, such as block copolymer self-assembly, colloidal self-assembly, DNA origami, roll-2-roll nano-imprint, etc., will not require the same level of perfection to meet specification. Given the variability of these self-assembly processes, in order to maintain process control, these techniques will require some level of real time online metrology. Hence we are led to the conclusion that future nanomanufacturing may well necessitate "cheap" nanometre scale metrology which functions real time and on-line, e.g. at GHz rates, in the production stream. In this paper we review top-down and bottom-up nanofabrication techniques and compare and contrast the various metrology requirements.

  16. Final-part metrology for LIGA springs, Build Group 1.

    Energy Technology Data Exchange (ETDEWEB)

    Aigeldinger, Georg; Skala, Dawn M.; Ceremuga, Joseph T.; Mills, Bernice E.

    2004-03-01

    The LIGA spring is a recently designed part for defense program applications. The Sandia California LIGA team has produced an initial group build of these nickel alloy parts. These are distinctive in having a macroscopic lateral size of about 1 cm, while requiring microscopic dimensional precision on the order of a few micrometers. LIGA technology capabilities at Sandia are able to manufacture such precise structures. While certain aspects of the LIGA process and its production capabilities have been dimensionally characterized in the past, [1-6] the present work is exclusive in defining a set of methods and techniques to inspect and measure final LIGA nickel alloy parts in large prototype quantities. One hundred percent inspection, meaning that every single LIGA part produced needs to be measured, ensures quality control and customer satisfaction in this prototype production run. After a general visual inspection of the parts and an x-ray check for voids, high precision dimensional metrology tools are employed. The acquired data is analyzed using both in house and commercially available software. Examples of measurements illustrating these new metrology capabilities are presented throughout the report. These examples furthermore emphasize that thorough inspection of every final part is not only essential to characterize but also improve the LIGA manufacturing process.

  17. Comparisons organized by Ionizing Radiation Metrology Laboratory of FTMC, Lithuania.

    Science.gov (United States)

    Gudelis, A; Gorina, I

    2016-03-01

    The newly established Ionizing Radiation Metrology Laboratory of the National Metrology Institute (FTMC) in Lithuania organized four comparisons in the field of low-level radioactivity measurements in water. For gamma-ray emitters, the activity concentration in the samples was in the range 1-25Bq/kg, while for tritium it was around 2Bq/g. The assigned values of all comparisons were traceable to the primary standards of the Czech Metrology Institute (CMI).

  18. Dimensional Metrology for Microtechnology

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2005-01-01

    This ph. D. project was aimed at developing and validating techniques for dimensional metrology of: miniaturized items, microsystem components, and surfaces. In particular the study was focused on techniques based on: AFM-CMM integration and Scanning Electron Microscopy (SEM). Development...... was proposed and the principle demonstrated on software gauges. Simulations of Surface Mapping were done, based on the model developed. Direct performance verification of the Large Range AFM was eventually carried out, and lateral metrology was possible, in the millimeter range, with accuracy in the order...... at high magnifications was, proposed and this has resulted into a patent application. The final part of the thesis is devoted to applications of dimensional metrology to case studies. Three applications are presented, two of them are investigations of surface metrology, while the third is about extraction...

  19. An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Settens, Charles M. [State Univ. of New York (SUNY), Albany, NY (United States)

    2015-01-01

    Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron critical dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.

  20. Metrological compatibility between dynamic and static measurement; Compatibilidade metrologica entre medicao dinamica e estatica de petroleo, seus derivados liquidos e alcool

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, Elcio Cruz de; Queiroz, Cleuber Wudson Torres [PETROBRAS Transporte S.A. (TRANSPETRO), Rio de Janeiro, RJ (Brazil)

    2005-07-01

    The measurement for custody transference is the cash register of all and any company whose activity end is to carry commodities. In the case of the oil industry and its liquid derivatives, this measurement is preferentially dynamic, for stations of measurement of the supplier and in second tier, for lack of this previous one, in static way, as normally practiced for the delivery companies, through difference of volumes, measured in tanks of storage. The objective of this work is to compare metrologically these two types of measurement and to evaluate, through its uncertainties of measurement, the compatibility between them. Considering itself, that the maximum values of reached uncertainty of measurement are of 0,3%, for measurements in line; we can accept a difference between dynamic measurement and static of up to 0,65% when the transferred volume uses 100% of the capacity of the vertical cylindrical reservoir, being able to arrive up to 16,07% when if we use only 5% of its nominal capacity. (author)

  1. Metrology at Philip Morris Europe

    Directory of Open Access Journals (Sweden)

    Gualandris R

    2014-12-01

    Full Text Available The importance of the metrology function at Philip Morris Europe (PME, a multinational organisation producing at over 40 sites in the European, Middle Eastern and African Regions is presented. Standardisation of test methods and equipment as well as the traceability of calibration gauges to the same reference gauge are essential in order to obtain comparable results among the various production centers. The metrology function as well as the qualification of instruments and the drafting of test and calibration operating procedures for this region are conducted or co-ordinated by the Research and Development Department in Neuchatel, Switzerland. In this paper the metrology function within PME is presented based on the measurement of the resistance to draw for which the PME R&D laboratory is accredited (ISO/CEI 17025, as both a calibration and a testing laboratory. The following topics are addressed in this paper: traceability of calibration standards to national standards; comparison of results among manufacturing centres; the choice, the budget as well as the computation of uncertainties. Furthermore, some practical aspects related to the calibration and use of the glass multicapillary gauges are discussed.

  2. A test battery measuring auditory capabilities of listening panels

    DEFF Research Database (Denmark)

    Ghani, Jody; Ellermeier, Wolfgang; Zimmer, Karin

    2005-01-01

    While the literature stresses the importance of expert panels and of training in evaluating sound-quality attributes, the abilities of experts have typically only been investigated for a very limited range of tasks (e.g. naming timbral qualities). It is therefore the aim of this study to develop...... a battery of tests covering a larger range of auditory capabilities in order to assess individual listeners. The format of all tests is kept as 'objective' as possible by using a three-alternative forced-choice paradigm in which the subject must choose which of the sound samples is different, thus keeping...... the instruction to the subjects simple and common for all tests. Both basic (e.g. frequency discrimination) and complex (e.g. profile analysis) psychoacoustic tests are covered in the battery and a threshold of discrimination or detection is obtained for each test. Data were collected on 24 listeners who had been...

  3. A test battery measuring auditory capabilities of listening panels

    DEFF Research Database (Denmark)

    Ghani, Jody; Ellermeier, Wolfgang; Zimmer, Karin

    2005-01-01

    a battery of tests covering a larger range of auditory capabilities in order to assess individual listeners. The format of all tests is kept as 'objective' as possible by using a three-alternative forced-choice paradigm in which the subject must choose which of the sound samples is different, thus keeping...... the instruction to the subjects simple and common for all tests. Both basic (e.g. frequency discrimination) and complex (e.g. profile analysis) psychoacoustic tests are covered in the battery and a threshold of discrimination or detection is obtained for each test. Data were collected on 24 listeners who had been...... recruited for participation in an expert listening panel for evaluating the sound quality of hi-fi audio systems. The test battery data were related to the actual performance of the listeners when judging the degradation in quality produced by audio codecs....

  4. An investigation of bridge width measurement and processing capabilities (1985)

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, K.P. [comp.

    1989-05-15

    An investigation of Mound`s ability to measure and process bridges was conducted in 1985. Prior to improvements in the measuring system and technique, bridge width was found to have a sigma of 0.00019 in. After improvements were made, a sigma of 0.000047 was realized. Bridge length was found to be more erratic than width, although most of the inaccuracy was caused by measurement uncertainty. Length and width were found to have little or no correlation.

  5. Advances in Solar Radiometry and Metrology

    Energy Technology Data Exchange (ETDEWEB)

    Myers, D.; Andreas, A.; Reda, I.; Gotseff, P.; Wilcox, S.; Stoffel, T.; Anderberg, M.

    2005-01-01

    The Solar Radiometry and Metrology task at the National Renewable Energy Laboratory (NREL) provides traceable optical radiometric calibrations and measurements to photovoltaic (PV) researchers and the PV industry. Traceability of NREL solar radiometer calibrations to the World Radiometric Reference (WRR) was accomplished during the NREL Pyrheliometer Comparison in October 2003. The task has calibrated 10 spectral and more than 180 broadband radiometers for solar measurements. Other accomplishments include characterization of pyranometer thermal offset errors with laboratory and spectral modeling tools; developing a simple scheme to correct pyranometer data for known responsivity variations; and measuring detailed spectral distributions of the NREL High Intensity Pulsed Solar Simulator (HIPSS) as a function of lamp voltage and time. The optical metrology functions support the NREL Measurement and Characterization Task effort for ISO 17025 accreditation of NREL Solar Reference Cell Calibrations. Optical metrology functions have been integrated into the NREL quality system and audited for ISO17025 compliance.

  6. Quantum control, quantum information processing, and quantum-limited metrology with trapped ions

    CERN Document Server

    Wineland, D J; Barrett, M D; Ben-Kish, A; Bergquist, J C; Blakestad, R B; Bollinger, J J; Britton, J L; Chiaverini, J; De Marco, B L; Hume, D; Itano, W M; Jensen, M; Jost, J D; Knill, E; Koelemeij, J C J; Langer, C; Oskay, W; Ozeri, R; Reichle, R; Rosenband, T; Schätz, T; Schmidt, P O; Seidelin, S

    2005-01-01

    We briefly discuss recent experiments on quantum information processing using trapped ions at NIST. A central theme of this work has been to increase our capabilities in terms of quantum computing protocols, but we have also applied the same concepts to improved metrology, particularly in the area of frequency standards and atomic clocks. Such work may eventually shed light on more fundamental issues, such as the quantum measurement problem.

  7. Metrology for Radiological Early Warning Networks in Europe ("METROERM")-A Joint European Metrology Research Project.

    Science.gov (United States)

    Neumaier, Stefan; Dombrowski, Harald; Kessler, Patrick

    2016-08-01

    As a consequence of the Chernobyl nuclear power plant accident in 1986, all European countries have installed automatic dosimetry network stations as well as air sampling systems for the monitoring of airborne radioactivity. In Europe, at present, almost 5,000 stations measure dose rate values in nearly real time. In addition, a few hundred air samplers are operated. Most of them need extended accumulation times with no real-time capability. National dose rate data are provided to the European Commission (EC) via the EUropean Radiological Data Exchange Platform (EURDEP). In case of a nuclear emergency with transboundary implications, the EC may issue momentous recommendations to EU member states based on the radiological data collected by EURDEP. These recommendations may affect millions of people and could have severe economic and sociological consequences. Therefore, the reliability of the EURDEP data is of key importance. Unfortunately, the dose rate and activity concentration data are not harmonized between the different networks. Therefore, within the framework of the European Metrology Research Programme (EMRP), 16 European institutions formed the consortium MetroERM with the aim to improve the metrological foundation of measurements and to introduce a pan-European harmonization for the collation and evaluation of radiological data in early warning network systems. In addition, a new generation of detector systems based on spectrometers capable of providing both reliable dose rate values as well as nuclide specific information in real time are in development. The MetroERM project and its first results will be presented and discussed in this article.

  8. Measurements of the Rate Capability of Various Resistive Plate Chambers

    CERN Document Server

    Affatigato, M; Bilki, B; Corriveau, F; Freund, B; Johnson, N; Neubueser, C; Onel, Y; Repond, J; Xia, L

    2015-01-01

    Resistive Plate Chambers (RPCs) exhibit a significant loss of efficiency for the detection of particles, when subjected to high particle fluxes. This rate limitation is related to the usually high resistivity of the resistive plates used in their construction. This paper reports on measurements of the performance of three different glass RPC designs featuring a different total resistance of the resistive plates. The measurements were performed with 120 GeV protons at varying beam intensities

  9. Metrology of microcomponents and nanostructures

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2004-01-01

    OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004......OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004...

  10. Metrology of microcomponents and nanostructures

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2004-01-01

    OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004......OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004...

  11. Metrology in physics, chemistry, and biology: differing perceptions.

    Science.gov (United States)

    Iyengar, Venkatesh

    2007-04-01

    The association of physics and chemistry with metrology (the science of measurements) is well documented. For practical purposes, basic metrological measurements in physics are governed by two components, namely, the measure (i.e., the unit of measurement) and the measurand (i.e., the entity measured), which fully account for the integrity of a measurement process. In simple words, in the case of measuring the length of a room (the measurand), the SI unit meter (the measure) provides a direct answer sustained by metrological concepts. Metrology in chemistry, as observed through physical chemistry (measures used to express molar relationships, volume, pressure, temperature, surface tension, among others) follows the same principles of metrology as in physics. The same basis percolates to classical analytical chemistry (gravimetry for preparing high-purity standards, related definitive analytical techniques, among others). However, certain transition takes place in extending the metrological principles to chemical measurements in complex chemical matrices (e.g., food samples), as it adds a third component, namely, indirect measurements (e.g., AAS determination of Zn in foods). This is a practice frequently used in field assays, and calls for additional steps to account for traceability of such chemical measurements for safeguarding reliability concerns. Hence, the assessment that chemical metrology is still evolving.

  12. Improvements to TITAN's Mass Measurement and Decay Spectroscopy Capabilities

    NARCIS (Netherlands)

    Lascar, D.; Kwiatkowski, A. A.; Alanssari, M.; Chowdhury, U.; Even, J.; Finlay, A.; Gallant, A. T.; Good, M.; Klawitter, R.; Kootte, B.; Leach, T. Li K. G.; Lennarz, A.; Leistenschneider, E.; Mayer, A. J.; Schultz, B. E.; Schupp, R.; Short, D. A.; Andreoiu, C.; Dilling, J.; Gwinner, G.

    2016-01-01

    The study of nuclei farther from the valley of $\\beta$-stability goes hand-in-hand with shorter-lived nuclei produced in smaller abundances than their more stable counterparts. The measurement, to high precision, of nuclear masses therefore requires innovations in technique in order to keep up.

  13. Evaluation of metrology technologies for free form surfaces

    DEFF Research Database (Denmark)

    Arámbula, K.; Siller, H.R.; De Chiffre, Leonardo

    2012-01-01

    This research work describes a novel approach for comparing different technologies for free form surface metrology: computerized tomography (CT), photogrammetry and coordinate measuring machines (CMM). The comparison has the aim of providing relevant information for the selection of metrology...... also deals with costs issues, required standards, and necessary additional information when selecting inspection equipment....

  14. Evaluation of metrology technologies for free form surfaces

    DEFF Research Database (Denmark)

    Arámbula, K.; Siller, H.R.; De Chiffre, Leonardo

    2012-01-01

    This research work describes a novel approach for comparing different technologies for free form surface metrology: computerized tomography (CT), photogrammetry and coordinate measuring machines (CMM). The comparison has the aim of providing relevant information for the selection of metrology...... also deals with costs issues, required standards, and necessary additional information when selecting inspection equipment....

  15. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  16. Coordinate Metrology by Traceable Computed Tomography

    DEFF Research Database (Denmark)

    Müller, Pavel

    metrology and coordinate metrology and is currently becoming more and more important measuring technique for dimensional measurements. This is mainly due to the fact that with CT, a complete three-dimensional model of the scanned part is in a relatively short time visualized using a computer...... is an important factor for decision making about manufactured parts. However, due to many influences in CT, estimation of the uncertainty is a challenge, also because standardized procedures and guidelines are not available yet. In this thesis, several methods for uncertainty estimation were applied in connection...

  17. Optical imaging and metrology

    CERN Document Server

    Osten, Wolfgang

    2012-01-01

    A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.

  18. Metrology for drug delivery.

    Science.gov (United States)

    Lucas, Peter; Klein, Stephan

    2015-08-01

    In various recently published studies, it is argued that there are underestimated risks with infusion technology, i.e., adverse incidents believed to be caused by inadequate administration of the drugs. This is particularly the case for applications involving very low-flow rates, i.e., metrological infrastructure for low-flow rates. Technical challenges such as these were the reason a European research project "Metrology for Drug Delivery" was started in 2011. In this special issue of Biomedical Engineering, the results of that project are discussed.

  19. Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?

    Science.gov (United States)

    Postek, Michael T., Jr.; Vladar, Andras E.; Bennett, Marylyn H.

    2002-12-01

    Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers and scanners used in the lithography process, and partly for the lesser need to account for the real three-dimensionality of the mask structures. So, where photomasks are concerned, many of the issues challenging wafer dimensional metrology at 1x are reduced by a factor of 4 or 5 and thus could be temporarily swept aside. This is rapidly changing with the introduction of advanced masks with optical proximity correction and phase shifting features used in 100 nm and smaller circuit generations. Fortunately, photomask metrology generally benefits from the advances made for wafer metrology, but there are still unique issues to be solved in this form of dimensional metrology. It is likely that no single metrology method or tool will ever provide all necessary answers. As with other types of metrology, resolution, sensitivity and linearity in the three-dimensional measurements of the shape of the lines and phase shifting features in general (width, height and wall angles) and the departures from the desired shape (surface and edge roughness, etc.) are the key parameters. Different methods and tools differ in their ability to collect averaged and localized signals with an acceptable speed, but in any case, application of this thorough knowledge of the physics of the given metrology is essential to extract the needed information. This paper will discuss the topics of precision, accuracy and traceability in the SEM metrology of photomasks. Current and possible new techniques utilized in the measurements of photomasks including charge suppression and highly accurate modeling for electron beam metrology will also be explored to answer the question "Has anything really changed?"

  20. Metrology and properties of engineering surfaces

    CERN Document Server

    Greenwood, J; Chetwynd, D

    2001-01-01

    Metrology and Properties of Engineering Surfaces provides in a single volume a comprehensive and authoritative treatment of the crucial topics involved in the metrology and properties of engineering surfaces. The subject matter is a central issue in manufacturing technology, since the quality and reliability of manufactured components depend greatly upon the selection and qualities of the appropriate materials as ascertained through measurement. The book can in broad terms be split into two parts; the first deals with the metrology of engineering surfaces and covers the important issues relating to the measurement and characterization of surfaces in both two and three dimensions. This covers topics such as filtering, power spectral densities, autocorrelation functions and the use of Fractals in topography. A significant proportion is dedicated to the calibration of scanning probe microscopes using the latest techniques. The remainder of the book deals with the properties of engineering surfaces and covers a w...

  1. Photonic wires sidewall roughness measures using AFM capabilities

    DEFF Research Database (Denmark)

    Malureanu, Radu; Frandsen, Lars Hagedorn

    2008-01-01

    Within the last years, interest in photonic wires and photonic crystals grew due to their demonstrated ability of controlling light propagation and characteristics. One of the limitations of such devices is due to the induced roughness during the fabrication process. Generally, an increase...... in roughness leads to loss increase thus limiting the propagation length and postponing the commercialization of such structures. In this paper we present a new algorithm for measuring the sidewall roughness of our devices based on atomic force microscope (AFM) approach. Using this algorithm, the roughness can...... be quantified and thus actions in decreasing it can be taken improving the device's performance....

  2. Measurement of Spatial Filtering Capabilities of Single Mode Infrared Fibers

    Science.gov (United States)

    Ksendzov, Alexander; Bloemhof, E.; White, V.; Wallace, J. K.; Gappinger, R. O.; Sanghera, J. S.; Busse, L. E.; Kim, W. J.; Pureza, P. C.; Nguyen, V. Q.; hide

    2006-01-01

    Spatial filtering is necessary to achieve deep nulls in optical interferometer and single mode infrared fibers can serve as spatial filters. The filtering function is based on the ability of these devices to perform the mode-cleaning function: only the component of the input field that is coupled to the single bound (fundamental) mode of the device propagates to the output without substantial loss. In practical fiber devices, there are leakage channels that cause light not coupled into the fundamental mode to propagate to the output. These include propagation through the fiber cladding and by means of a leaky mode. We propose a technique for measuring the magnitude of this leakage and apply it to infrared fibers made at the Naval Research Laboratory and at Tel Aviv University.

  3. Oscillator metrology with software defined radio.

    Science.gov (United States)

    Sherman, Jeff A; Jördens, Robert

    2016-05-01

    Analog electrical elements such as mixers, filters, transfer oscillators, isolating buffers, dividers, and even transmission lines contribute technical noise and unwanted environmental coupling in time and frequency measurements. Software defined radio (SDR) techniques replace many of these analog components with digital signal processing (DSP) on rapidly sampled signals. We demonstrate that, generically, commercially available multi-channel SDRs are capable of time and frequency metrology, outperforming purpose-built devices by as much as an order-of-magnitude. For example, for signals at 10 MHz and 6 GHz, we observe SDR time deviation noise floors of about 20 fs and 1 fs, respectively, in under 10 ms of averaging. Examining the other complex signal component, we find a relative amplitude measurement instability of 3 × 10(-7) at 5 MHz. We discuss the scalability of a SDR-based system for simultaneous measurement of many clocks. SDR's frequency agility allows for comparison of oscillators at widely different frequencies. We demonstrate a novel and extreme example with optical clock frequencies differing by many terahertz: using a femtosecond-laser frequency comb and SDR, we show femtosecond-level time comparisons of ultra-stable lasers with zero measurement dead-time.

  4. Hybrid photonic chip interferometer for embedded metrology

    Science.gov (United States)

    Kumar, P.; Martin, H.; Maxwell, G.; Jiang, X.

    2014-03-01

    Embedded metrology is the provision of metrology on the manufacturing platform, enabling measurement without the removal of the work piece. Providing closer integration of metrology upon the manufacturing platform can lead to the better control and increased throughput. In this work we present the development of a high precision hybrid optical chip interferometer metrology device. The complete metrology sensor system is structured into two parts; optical chip and optical probe. The hybrid optical chip interferometer is based on a silica-on-silicon etched integrated-optic motherboard containing waveguide structures and evanescent couplers. Upon the motherboard, electro-optic components such as photodiodes and a semiconductor gain block are mounted and bonded to provide the required functionality. The key structure in the device is a tunable laser module based upon an external-cavity diode laser (ECDL). Within the cavity is a multi-layer thin film filter which is rotated to select the longitudinal mode at which the laser operates. An optical probe, which uses a blazed diffracting grating and collimating objective lens, focuses light of different wavelengths laterally over the measurand. Incident laser light is then tuned in wavelength time to effectively sweep an `optical stylus' over the surface. Wavelength scanning and rapid phase shifting can then retrieve the path length change and thus the surface height. We give an overview of the overall design of the final hybrid photonic chip interferometer, constituent components, device integration and packaging as well as experimental test results from the current version now under evaluation.

  5. Heisenberg limit superradiant superresolving metrology.

    Science.gov (United States)

    Wang, Da-Wei; Scully, Marlan O

    2014-08-22

    We propose a superradiant metrology technique to achieve the Heisenberg limit superresolving displacement measurement by encoding multiple light momenta into a three-level atomic ensemble. We use 2N coherent pulses to prepare a single excitation superradiant state in a superposition of two timed Dicke states that are 4N light momenta apart in momentum space. The phase difference between these two states induced by a uniform displacement of the atomic ensemble has 1/4N sensitivity. Experiments are proposed in crystals and in ultracold atoms.

  6. Frequency Standards and Metrology

    Science.gov (United States)

    Maleki, Lute

    2009-04-01

    Preface / Lute Maleki -- Symposium history / Jacques Vanier -- Symposium photos -- pt. I. Fundamental physics. Variation of fundamental constants from the big bang to atomic clocks: theory and observations (Invited) / V. V. Flambaum and J. C. Berengut. Alpha-dot or not: comparison of two single atom optical clocks (Invited) / T. Rosenband ... [et al.]. Variation of the fine-structure constant and laser cooling of atomic dysprosium (Invited) / N. A. Leefer ... [et al.]. Measurement of short range forces using cold atoms (Invited) / F. Pereira Dos Santos ... [et al.]. Atom interferometry experiments in fundamental physics (Invited) / S. W. Chiow ... [et al.]. Space science applications of frequency standards and metrology (Invited) / M. Tinto -- pt. II. Frequency & metrology. Quantum metrology with lattice-confined ultracold Sr atoms (Invited) / A. D. Ludlow ... [et al.]. LNE-SYRTE clock ensemble: new [symbol]Rb hyperfine frequency measurement - spectroscopy of [symbol]Hg optical clock transition (Invited) / M. Petersen ... [et al.]. Precise measurements of S-wave scattering phase shifts with a juggling atomic clock (Invited) / S. Gensemer ... [et al.]. Absolute frequency measurement of the [symbol] clock transition (Invited) / M. Chwalla ... [et al.]. The semiclassical stochastic-field/atom interaction problem (Invited) / J. Camparo. Phase and frequency noise metrology (Invited) / E. Rubiola ... [et al.]. Optical spectroscopy of atomic hydrogen for an improved determination of the Rydberg constant / J. L. Flowers ... [et al.] -- pt. III. Clock applications in space. Recent progress on the ACES mission (Invited) / L. Cacciapuoti and C. Salomon. The SAGAS mission (Invited) / P. Wolf. Small mercury microwave ion clock for navigation and radioScience (Invited) / J. D. Prestage ... [et al.]. Astro-comb: revolutionizing precision spectroscopy in astrophysics (Invited) / C. E. Kramer ... [et al.]. High frequency very long baseline interferometry: frequency standards and

  7. Data fusion for accurate microscopic rough surface metrology.

    Science.gov (United States)

    Chen, Yuhang

    2016-06-01

    Data fusion for rough surface measurement and evaluation was analyzed on simulated datasets, one with higher density (HD) but lower accuracy and the other with lower density (LD) but higher accuracy. Experimental verifications were then performed on laser scanning microscopy (LSM) and atomic force microscopy (AFM) characterizations of surface areal roughness artifacts. The results demonstrated that the fusion based on Gaussian process models is effective and robust under different measurement biases and noise strengths. All the amplitude, height distribution, and spatial characteristics of the original sample structure can be precisely recovered, with better metrological performance than any individual measurements. As for the influencing factors, the HD noise has a relatively weaker effect as compared with the LD noise. Furthermore, to enable an accurate fusion, the ratio of LD sampling interval to surface autocorrelation length should be smaller than a critical threshold. In general, data fusion is capable of enhancing the nanometrology of rough surfaces by combining efficient LSM measurement and down-sampled fast AFM scan. The accuracy, resolution, spatial coverage and efficiency can all be significantly improved. It is thus expected to have potential applications in development of hybrid microscopy and in surface metrology.

  8. Childhood socioeconomic position and objectively measured physical capability levels in adulthood

    DEFF Research Database (Denmark)

    Birnie, Kate; Cooper, Rachel; Martin, Richard M;

    2011-01-01

    Grip strength, walking speed, chair rising and standing balance time are objective measures of physical capability that characterise current health and predict survival in older populations. Socioeconomic position (SEP) in childhood may influence the peak level of physical capability achieved...... in early adulthood, thereby affecting levels in later adulthood. We have undertaken a systematic review with meta-analyses to test the hypothesis that adverse childhood SEP is associated with lower levels of objectively measured physical capability in adulthood....

  9. Vacuum Technology Considerations For Mass Metrology

    Science.gov (United States)

    Abbott, Patrick J.; Jabour, Zeina J.

    2011-01-01

    Vacuum weighing of mass artifacts eliminates the necessity of air buoyancy correction and its contribution to the measurement uncertainty. Vacuum weighing is also an important process in the experiments currently underway for the redefinition of the SI mass unit, the kilogram. Creating the optimum vacuum environment for mass metrology requires careful design and selection of construction materials, plumbing components, pumping, and pressure gauging technologies. We review the vacuum technology1 required for mass metrology and suggest procedures and hardware for successful and reproducible operation. PMID:26989593

  10. Metrology Sampling Strategies for Process Monitoring Applications

    KAUST Repository

    Vincent, Tyrone L.

    2011-11-01

    Shrinking process windows in very large scale integration semiconductor manufacturing have already necessitated the development of control systems capable of addressing sub-lot-level variation. Within-wafer control is the next milestone in the evolution of advanced process control from lot-based and wafer-based control. In order to adequately comprehend and control within-wafer spatial variation, inline measurements must be performed at multiple locations across the wafer. At the same time, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed using the standard statistical tools of principle component analysis and canonical correlation analysis. The proposed selection method is validated using real manufacturing data, and results indicate that it is possible to significantly reduce the number of measurements with little loss in the information obtained for the process control systems. © 2011 IEEE.

  11. Applications of on-product diffraction-based focus metrology in logic high volume manufacturing

    Science.gov (United States)

    Noyes, Ben F.; Mokaberi, Babak; Bolton, David; Li, Chen; Palande, Ashwin; Park, Kevin; Noot, Marc; Kea, Marc

    2016-03-01

    The integration of on-product diffraction-based focus (DBF) capability into the majority of immersion lithography layers in leading edge logic manufacturing has enabled new applications targeted towards improving cycle time and yield. A CD-based detection method is the process of record (POR) for excursion detection. The drawback of this method is increased cycle time and limited sampling due to CD-SEM metrology capacity constraints. The DBFbased method allows the addition of focus metrology samples to the existing overlay measurements on the integrated metrology (IM) system. The result enables the addition of measured focus to the SPC system, allowing a faster excursion detection method. For focus targeting, the current method involves using a dedicated focus-exposure matrix (FEM) on all scanners, resulting in lengthy analysis times and uncertainty in the best focus. The DBF method allows the measurement to occur on the IM system, on a regular production wafer, and at the same time as the exposure. This results in a cycle time gain as well as a less subjective determination of best focus. A third application aims to use the novel onproduct focus metrology data in order to apply per-exposure focus corrections to the scanner. These corrections are particularly effective at the edge of the wafer, where systematic layer-dependent effects can be removed using DBFbased scanner feedback. This paper will discuss the development of a methodology to accomplish each of these applications in a high-volume production environment. The new focus metrology method, sampling schemes, feedback mechanisms and analysis methods lead to improved focus control, as well as earlier detection of failures.

  12. Quantum metrology with cold atomic ensembles

    Directory of Open Access Journals (Sweden)

    Mitchell Morgan W.

    2013-08-01

    Full Text Available Quantum metrology uses quantum features such as entanglement and squeezing to improve the sensitivity of quantum-limited measurements. Long established as a valuable technique in optical measurements such as gravitational-wave detection, quantum metrology is increasingly being applied to atomic instruments such as matter-wave interferometers, atomic clocks, and atomic magnetometers. Several of these new applications involve dual optical/atomic quantum systems, presenting both new challenges and new opportunities. Here we describe an optical magnetometry system that achieves both shot-noise-limited and projection-noise-limited performance, allowing study of optical magnetometry in a fully-quantum regime [1]. By near-resonant Faraday rotation probing, we demonstrate measurement-based spin squeezing in a magnetically-sensitive atomic ensemble [2-4]. The versatility of this system allows us also to design metrologically-relevant optical nonlinearities, and to perform quantum-noise-limited measurements with interacting photons. As a first interaction-based measurement [5], we implement a non-linear metrology scheme proposed by Boixo et al. with the surprising feature of precision scaling better than the 1/N “Heisenberg limit” [6].

  13. Fractal Metrology for biogeosystems analysis

    Directory of Open Access Journals (Sweden)

    V. Torres-Argüelles

    2010-11-01

    Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  14. Fractal Metrology for biogeosystems analysis

    Science.gov (United States)

    Torres-Argüelles, V.; Oleschko, K.; Tarquis, A. M.; Korvin, G.; Gaona, C.; Parrot, J.-F.; Ventura-Ramos, E.

    2010-11-01

    The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay) and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc.) while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM). We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  15. Fractal metrology for biogeosystems analysis

    Directory of Open Access Journals (Sweden)

    V. Torres-Argüelles

    2010-06-01

    Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes. In the present research, this pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate'' Clay and compared in terms of roughness of the gray-intensity distribution (the measurand quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them and to the measurement function which best fits to the experimental results. Some of the applied techniques are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of all these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM through a case study of soil physical and chemical degradation applying the selected toolbox to describe and compare the main structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  16. Traceability and uncertainty estimation in coordinate metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

    2001-01-01

    are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

  17. Note: Near infrared interferometric silicon wafer metrology.

    Science.gov (United States)

    Choi, M S; Park, H M; Joo, K N

    2016-04-01

    In this investigation, two near infrared (NIR) interferometric techniques for silicon wafer metrology are described and verified with experimental results. Based on the transparent characteristic of NIR light to a silicon wafer, the fiber based spectrally resolved interferometry can measure the optical thickness of the wafer and stitching low coherence scanning interferometry can reconstruct entire surfaces of the wafer.

  18. FOREWORD: Special issue on Statistical and Probabilistic Methods for Metrology

    Science.gov (United States)

    Bich, Walter; Cox, Maurice G.

    2006-08-01

    This special issue of Metrologia is the first that is not devoted to units, or constants, or measurement techniques in some specific field of metrology, but to the generic topic of statistical and probabilistic methods for metrology. The number of papers on this subject in measurement journals, and in Metrologia in particular, has continued to increase over the years, driven by the publication of the Guide to the Expression of Uncertainty in Measurement (GUM) [1] and the Mutual Recognition Arrangement (MRA) of the CIPM [2]. The former stimulated metrologists to think in greater depth about the appropriate modelling of their measurements, in order to provide uncertainty evaluations associated with measurement results. The latter obliged the metrological community to investigate reliable measures for assessing the calibration and measurement capabilities declared by the national metrology institutes (NMIs). Furthermore, statistical analysis of measurement data became even more important than hitherto, with the need, on the one hand, to treat the greater quantities of data provided by sophisticated measurement systems, and, on the other, to deal appropriately with relatively small sets of data that are difficult or expensive to obtain. The importance of supporting the GUM and extending its provisions was recognized by the formation in the year 2000 of Working Group 1, Measurement uncertainty, of the Joint Committee for Guides in Metrology. The need to provide guidance on key comparison data evaluation was recognized by the formation in the year 2001 of the BIPM Director's Advisory Group on Uncertainty. A further international initiative was the revision, in the year 2004, of the remit and title of a working group of ISO/TC 69, Application of Statistical Methods, to reflect the need to concentrate more on statistical methods to support measurement uncertainty evaluation. These international activities are supplemented by national programmes such as the Software Support

  19. In-situ metrology for the optimization of bent crystals used in hard-X-ray monochromators: Comparison between measurement and simulation

    Energy Technology Data Exchange (ETDEWEB)

    Thomasset, Muriel, E-mail: muriel.thomasset@synchrotron-soleil.f [Synchrotron SOLEIL, L' orme des Merisiers, BP 48, 91192 Gif sur Yvette (France); Moreno, Thierry; Capitanio, Blandine; Idir, Mourad [Synchrotron SOLEIL, L' orme des Merisiers, BP 48, 91192 Gif sur Yvette (France); Bucourt, Samuel [Imagine Optic, 18 rue Charles de Gaulle, Orsay 91400 (France)

    2010-05-01

    Crystal sagittal focusing is known as one of the most efficient way of focusing synchrotron X-ray radiation from bending magnet sources, thus delivering increases photon flux at the sample position. To optimize the performance of a sagittaly bent crystal inside a monochromator, it is necessary to have knowledge of its radius of curvature. However, this measurement is not very easy to obtain. Even though the use of the X-ray beam is the ultimate source for optimizing the system, it is still necessary to have a prior knowledge of the radius of curvature as a function of the motor bender positions to avoid any catastrophic failure. In this paper, we describe a simple, efficient and accurate method of measuring the radius of curvature of sagitally bent monochromator crystals at several bending magnet beamlines at synchrotron SOLEIL. To optimize the crystal bending inside these monochromators, we used a Shack-Hartmann sensor (HP 26) developed by the Imagine Optic Company (Orsay/France). This high accuracy two-dimensional metrology tool was originally designed to be installed on a Long Trace Profiler translation stage to measure the mirrors profiles. During a period where the SOLEIL synchrotron was in shutdown, this instrument was directly mounted inside the monochromator so that the radius of curvature could be measured in-situ. This method allows us to optimize the curvature and eliminate twist before bending strongly the crystal below radii of curvature of less than 2 m. The second step in the optimization process was to use the X-ray beam for the final adjustments of the bending system, where X-ray images are then used to analyse the residual defaults of the system. Using SpotX, a ray-tracing simulation tool, these errors can be fully analysed and a fully optimized system can then be obtained. Overall, five beamlines at synchrotron SOLEIL have used in this method to optimize their monochromators.

  20. Advanced hardware and software methods for thread and gear dimensional metrology. CRADA final report

    Energy Technology Data Exchange (ETDEWEB)

    Miller, A.C. Jr.; Grann, E.B.

    1997-03-05

    The Oak Ridge Centers for Manufacturing Technology (ORCMT) and Apeiron Incorporated have collaborated on an effort to develop a frequency modulated continuous wave (FMCW) fiber lidar system for dimensional metrology of internal threads, gears, and splines. The purpose of this effort was to assist a small company in developing an instrument that would exceed the performance of competing foreign instruments and provide measurement capabilities necessary to assure compliance for NASA facilities and other industrial facilities. The two parties collaborated on design, assembly, and bench testing of the prototype instrument. The prototype system was targeted to have the capability of profiling internally machined gears and threads to an accuracy of less than a micron.

  1. Requirements of weighing in legal metrology

    Science.gov (United States)

    Källgren, Håkan; Pendrill, Leslie

    2003-12-01

    A review is given of recent developments in the formulation of requirements of weighing where such measurements are performed in society and industry with legal implications such as safety, fair trade and environmental considerations. Traditional legal metrology in the area of weights and measures has been developed and given an expanded scope in recent years. This reflects, on the one hand, technical and scientific development (computerization of weighing devices, improved weight manufacturing and new methods of magnetism determination, for example), and on the other hand, administrative evolution (global requirements of the market and the Measurement Instrument Directive). Particularly fruitful has been the joint effort by the scientific mass metrology and legal metrology communities in the development in the last decade of international recommendations—especially OIML R111—on weighing. Consensus has been reached in the international weighing forum concerning important areas such as maximum permissible errors for weights, how to calculate measurement uncertainty and how measurement uncertainty should be accounted for in relation to conformity assessment. These international recommendations for weights as mass standards include both tolerances and extensive instructions about various influence quantities that affect the weight result, such as magnetization, surface roughness and volume of weights. Much remains to be done, however: corresponding requirements of weighing devices in particular need to meet the challenges of a rapidly changing technology. The promising collaboration between scientific and legal metrology initiated in the area of weights may act as a model and stimulate similar developments in other areas of metrology, particularly where requirements are generic (for instance uncertainty and conformity) or analogous.

  2. Metrology and Time

    CERN Document Server

    Rybak, B

    1999-01-01

    The algorithm Pi/sinx reveals an elliptic excess which acts as the real component (Space) inducing the imaginary component (Time). Key words : metrology, chronogenesis, tropic year, anomalistic year. ----- L 'algorithme Pi/sinx revele un excedent elliptique constituant la composante active d ' espace dont la composante reactive exprime la chronogenese tropique aussi bien qu ' anomalistique.. Mots-cles : metrologie, chronogenese, annee tropique, annee anomalistique

  3. Swept Frequency Laser Metrology System

    Science.gov (United States)

    Zhao, Feng (Inventor)

    2010-01-01

    A swept frequency laser ranging system having sub-micron accuracy that employs multiple common-path heterodyne interferometers, one coupled to a calibrated delay-line for use as an absolute reference for the ranging system. An exemplary embodiment uses two laser heterodyne interferometers to create two laser beams at two different frequencies to measure distance and motions of target(s). Heterodyne fringes generated from reflections off a reference fiducial X(sub R) and measurement (or target) fiducial X(sub M) are reflected back and are then detected by photodiodes. The measured phase changes Delta phi(sub R) and Delta phi (sub m) resulting from the laser frequency swept gives target position. The reference delay-line is the only absolute reference needed in the metrology system and this provides an ultra-stable reference and simple/economical system.

  4. Capability Deprivation and Income Poverty in the United States, 1994 and 2004: Measurement Outcomes and Demographic Profiles

    Science.gov (United States)

    Wagle, Udaya R.

    2009-01-01

    Shifting focus from income to capability signifies an important milestone toward accurately measuring poverty and deprivation. This paper operationalizes capability deprivation in the United States and compares measurement outcomes among various capability approaches and between capability and income spaces. Of the three capability approaches…

  5. Metrology Of Silicide Contacts For Future CMOS

    Science.gov (United States)

    Zollner, Stefan; Gregory, Richard B.; Kottke, M. L.; Vartanian, Victor; Wang, Xiang-Dong; Theodore, David; Fejes, P. L.; Conner, J. R.; Raymond, Mark; Zhu, Xiaoyan; Denning, Dean; Bolton, Scott; Chang, Kyuhwan; Noble, Ross; Jahanbani, Mohamad; Rossow, Marc; Goedeke, Darren; Filipiak, Stan; Garcia, Ricardo; Jawarani, Dharmesh; Taylor, Bill; Nguyen, Bich-Yen; Crabtree, P. E.; Thean, Aaron

    2007-09-01

    Silicide materials (NiSi, CoSi2, TiSi2, etc) are used to form low-resistance contacts between the back-end (W plugs and Cu interconnects) and front-end portions (silicon source, drain, and gate regions) of integrated CMOS circuits. At the 65 nm node, a transition from CoSi2 to NiSi was necessary because of the unique capability of NiSi to form narrow silicide nanowires on active (monocrystalline) and gate (polycrystalline) lines. Like its predecessors TiSi2 and CoSi2, NiSi is a mid-gap silicide, i.e., the Fermi level of the NiSi metal is pinned half-way between the conduction and valence band edges in silicon. This leads to a Schottky barrier between the silicide and silicon source-drain regions, which creates undesirable parasitic resistances. For future CMOS generations, band-edge silicides, such as PtSi for contacts to p-type or rare earth silicides for contacts to n-type Si will be needed. This paper reviews metrology and characterization techniques for NiSi process control for development and manufacturing, with special emphasis on x-ray reflectance and x-ray fluorescence. We also report measurement methods useful for development of a PtSi PMOS module.

  6. The development of capability measures in health economics: opportunities, challenges and progress.

    Science.gov (United States)

    Coast, Joanna; Kinghorn, Philip; Mitchell, Paul

    2015-04-01

    Recent years have seen increased engagement amongst health economists with the capability approach developed by Amartya Sen and others. This paper focuses on the capability approach in relation to the evaluative space used for analysis within health economics. It considers the opportunities that the capability approach offers in extending this space, but also the methodological challenges associated with moving from the theoretical concepts to practical empirical applications. The paper then examines three 'families' of measures, Oxford Capability instruments (OxCap), Adult Social Care Outcome Toolkit (ASCOT) and ICEpop CAPability (ICECAP), in terms of the methodological choices made in each case. The paper concludes by discussing some of the broader issues involved in making use of the capability approach in health economics. It also suggests that continued exploration of the impact of different methodological choices will be important in moving forward.

  7. Implementation of a metrology programme to provide traceability for radionuclides activity measurements in the CNEN Radiopharmaceuticals Producers Centers

    Energy Technology Data Exchange (ETDEWEB)

    Andrade, Erica A.L. de; Braghirolli, Ana M.S.; Tauhata, Luiz; Gomes, Regio S.; Silva, Carlos J., E-mail: erica@ien.gov.br [Instituto de Engenharia Nuclear (IEN/CNEN-RJ), Rio de Janeiro, RJ (Brazil); Delgado, Jose U.; Oliveira, Antonio E.; Iwahara, Akira, E-mail: ealima@ird.gov.br [Instituto de Radioprotecao e Dosimetria (IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil)

    2013-07-01

    The commercialization and use of radiopharmaceuticals in Brazil are regulated by Agencia Nacional de Vigilancia Sanitaria (ANVISA) which require Good Manufacturing Practices (GMP) certification for Radiopharmaceuticals Producer Centers. Quality Assurance Program should implement the GMP standards to ensure radiopharmaceuticals have requirements quality to proving its efficiency. Several aspects should be controlled within the Quality Assurance Programs, and one of them is the traceability of the Radionuclides Activity Measurement in radiopharmaceuticals doses. The quality assurance of activity measurements is fundamental to maintain both the efficiency of the nuclear medicine procedures and patient and exposed occupationally individuals safety. The radiation doses received by patients, during the nuclear medicine procedures, is estimated according to administered radiopharmaceuticals quantity. Therefore it is very important either the activity measurements performed in radiopharmaceuticals producer centers (RPC) as the measurements performed in nuclear medicine services are traceable to national standards. This paper aims to present an implementation program to provide traceability to radionuclides activity measurements performed in the dose calibrators(well type ionization chambers) used in Radiopharmaceuticals Producer Center placed in different states in Brazil. The proposed program is based on the principles of GM Pand ISO 17025 standards. According to dose calibrator performance, the RPC will be able to provide consistent, safe and effective radioactivity measurement to the nuclear medicine services. (author)

  8. National Needs for Appearance Metrology

    Science.gov (United States)

    Nadal, Maria E.

    2003-04-01

    Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

  9. Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

    NARCIS (Netherlands)

    Rietveld, G.; Elferen, H.J. van; Giesbers, A.J.M.; Veligura, A.; Zeitler, U.; Novoselov, K.S.; Wees, B.J. van; Geim, A.K.; Maan, J.C.

    2010-01-01

    Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

  10. Towards Photonics Enabled Quantum Metrology of Temperature, Pressure and Vacuum

    CERN Document Server

    Ahmed, Zeeshan; Douglass, Kevin; Fedchak, Jim; Scherschligt, Julia; Hendricks, Jay; Ricker, Jacob; Strouse, Gregory

    2016-01-01

    This chapter presents a brief overview of photonic sensor and standards development that is currently undergoing in the thermodynamic metrology group at NIST in the areas of temperature, pressure, vacuum and time-resolved pressure measurements.

  11. Overlay metrology for double patterning processes

    Science.gov (United States)

    Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

    2009-03-01

    The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double

  12. Design, fabrication and metrological evaluation of wearable pressure sensors.

    Science.gov (United States)

    Goy, C B; Menichetti, V; Yanicelli, L M; Lucero, J B; López, M A Gómez; Parodi, N F; Herrera, M C

    2015-04-01

    Pressure sensors are valuable transducers that are necessary in a huge number of medical application. However, the state of the art of compact and lightweight pressure sensors with the capability of measuring the contact pressure between two surfaces (contact pressure sensors) is very poor. In this work, several types of wearable contact pressure sensors are fabricated using different conductive textile materials and piezo-resistive films. The fabricated sensors differ in size, the textile conductor used and/or the number of layers of the sandwiched piezo-resistive film. The intention is to study, through the obtaining of their calibration curves, their metrological properties (repeatability, sensitivity and range) and determine which physical characteristics improve their ability for measuring contact pressures. It has been found that it is possible to obtain wearable contact pressure sensors through the proposed fabrication process with satisfactory repeatability, range and sensitivity; and that some of these properties can be improved by the physical characteristics of the sensors.

  13. Metrology for Fuel Cell Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Stocker, Michael [National Inst. of Standards and Technology, Gaithersburg, MD (United States); Stanfield, Eric [National Inst. of Standards and Technology, Gaithersburg, MD (United States)

    2015-02-04

    The project was divided into three subprojects. The first subproject is Fuel Cell Manufacturing Variability and Its Impact on Performance. The objective was to determine if flow field channel dimensional variability has an impact on fuel cell performance. The second subproject is Non-contact Sensor Evaluation for Bipolar Plate Manufacturing Process Control and Smart Assembly of Fuel Cell Stacks. The objective was to enable cost reduction in the manufacture of fuel cell plates by providing a rapid non-contact measurement system for in-line process control. The third subproject is Optical Scatterfield Metrology for Online Catalyst Coating Inspection of PEM Soft Goods. The objective was to evaluate the suitability of Optical Scatterfield Microscopy as a viable measurement tool for in situ process control of catalyst coatings.

  14. Development of a compact, fiber-coupled, six degree-of-freedom measurement system for precision linear stage metrology.

    Science.gov (United States)

    Yu, Xiangzhi; Gillmer, Steven R; Woody, Shane C; Ellis, Jonathan D

    2016-06-01

    A compact, fiber-coupled, six degree-of-freedom measurement system which enables fast, accurate calibration, and error mapping of precision linear stages is presented. The novel design has the advantages of simplicity, compactness, and relatively low cost. This proposed sensor can simultaneously measure displacement, two straightness errors, and changes in pitch, yaw, and roll using a single optical beam traveling between the measurement system and a small target. The optical configuration of the system and the working principle for all degrees-of-freedom are presented along with the influence and compensation of crosstalk motions in roll and straightness measurements. Several comparison experiments are conducted to investigate the feasibility and performance of the proposed system in each degree-of-freedom independently. Comparison experiments to a commercial interferometer demonstrate error standard deviations of 0.33 μm in straightness, 0.14 μrad in pitch, 0.44 μradin yaw, and 45.8 μrad in roll.

  15. Experimental set-up for testing alignment and measurement stability of a metrology system in Silicon Carbide for GAIA

    NARCIS (Netherlands)

    Veggel, M. van; Wielders, A.A.; Brug, H. van; Rosielle, N.; Nijmeijer, H.

    2005-01-01

    The GAI A satellite will make a 3-D map of our Galaxy with measurement accuracy of 10 microarcseconds using two astrometric telescopes. The angle between the lines-of-sight of the two telescopes will be monitored using the Basic Angle Monitoring system with 1 microarcsecond accuracy. This system wil

  16. Freeform metrology using subaperture stitching interferometry

    Science.gov (United States)

    Supranowitz, Chris; Lormeau, Jean-Pierre; Maloney, Chris; Murphy, Paul; Dumas, Paul

    2016-11-01

    As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input "hitmap" to the deterministic polishing process.

  17. Optical vortex metrology for non-destructive testing

    DEFF Research Database (Denmark)

    Wang, W.; Hanson, Steen Grüner

    2009-01-01

    Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis.......Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis....

  18. Using grating based X-ray contrast modalities for metrology

    DEFF Research Database (Denmark)

    Angel, Jais Andreas Breusch; Lauridsen, T.; Feidenhans'l, R.

    2014-01-01

    Traditionally, segmentation between multi-materials in CT is only available for cases, where material densities are not close to each other. A novel method called GBI offers a new possibility to overcome this problem, and was evaluated with respect to its metrological performance by comparisons...... to traceable measurements. The measurement results show that further development related to stability issues on the used CT is needed to create a metrological tool using GBI....

  19. IT Security Standards and Legal Metrology - Transfer and Validation

    Science.gov (United States)

    Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

    2014-08-01

    Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

  20. The study of high-sensitivity metrology method by using CD-SEM

    Science.gov (United States)

    Ueda, K.; Koshihara, S.; Mizuno, T.; Miura, A.

    2011-03-01

    The earliest semiconductor device manufacturing employed optical microscopes for measurement and control of the manufacturing process. The introduction of the Critical Dimension Scanning Electron Microscope (CD-SEM) in 1984 provided a tremendous increase in capability for process monitoring and has been the standard for in-line metrology for over 25 years. The advantages of the CD-SEM are highly accurate and stable measurement reproducibility at very specific locations throughout the device. The evolution of the CD-SEM in Metrology has included improved resolution, development of advanced measurement and pattern recognition algorithms, all required by performance improvement demands from the market. Current conventional metrology using the in-line CD-SEM involves measuring about ten points per wafer (one point per one chip). at a magnification of over x150k(Field of View is about 1μm2). In contrast, the area of measurement pattern on chip is much larger than the area of CD-SEM measurement (mm2 : (on chip) versus μm2 : (CD-SEM measurement)). This would mean that the result of the CD-SEM measurement is influenced by local pattern variation. The very stringent requirements placed on in-line Metrology for the last couple of technology nodes has produced an additional metrology methodology, beyond the CD-SEM, that involves large area measurements with very high precision for the most critical levels. We will refer to this methodology as "Macro Area Measurements". We investigated the applicability of using a CD-SEM Macro Area Measurement methodology in this paper. The areas investigated focused on the following points: 1) Determining the optimum CD-SEM sampling plan for a macro area measurement. 2) Optimization of the measurement parameters. 3) Optimization of the measurement condition. 4) Verification of Macro Area Measurement with an FEM (Focus Exposure Matrix) wafer. In the results, we are able to validate a new methodology that we called "Macro Area Measurement

  1. Uterine metrology devices for IUD selection.

    Science.gov (United States)

    1981-11-01

    Accurate measurements of the length of the uterine cavity would make it feasible to select an IUD that is compatible with a given cavity size. Considerable evidence exists to indicate that selecting an IUD on the basis of accurate longitudinal measurements of the uterine cavity improves IUD performance. There are study findings to suggest that as more data are available, specific IUDs can be prescribed for defined ranges of uterine cavity length. Metrology (uterine measuring) devices improve the ability of the clinican to measure accurately longitudinal and, in some instances, lateral dimensions of the uterine cavity. Longitudinal measurements depend on identifying the location of the internal os in order to determine the total length of the cervical canal. Lateral metrology devices also provide a measurement of uterine cavity width. Pain and discomfort associated with the use of the prototype lateral measurement instruments developed thus far is a major deterrent to their wide-scale use. 2 metrology devices -- the Crochet Hook Sound and the Hasson Wing Sound -- are designed to obtain longitudinal measurements of total uterine cavity length and of the length of the cervical canel. 2 new instruments -- the Cavimeter and the Hasson Wing Sound 2 -- designed to obtain both lateral and longitudinal measurements are now available for evaluation. The Hasson Wing Sound appears to be the only uterine metrology device available for service programs that could affect continuation rates of IUD users. It can measure the length of the uterine cavity directly, thus permitting improved IUD selection of individual women or the ability to exclude women who should not be IUD users because of small uterine size. An illustration of the prescriptive approach is included in a table.

  2. 100 years of radionuclide metrology.

    Science.gov (United States)

    Judge, S M; Arnold, D; Chauvenet, B; Collé, R; De Felice, P; García-Toraño, E; Wätjen, U

    2014-05-01

    The discipline of radionuclide metrology at national standards institutes started in 1913 with the certification by Curie, Rutherford and Meyer of the first primary standards of radium. In early years, radium was a valuable commodity and the aim of the standards was largely to facilitate trade. The focus later changed to providing standards for the new wide range of radionuclides, so that radioactivity could be used for healthcare and industrial applications while minimising the risk to patients, workers and the environment. National measurement institutes responded to the changing demands by developing new techniques for realising primary standards of radioactivity. Looking ahead, there are likely to be demands for standards for new radionuclides used in nuclear medicine, an expansion of the scope of the field into quantitative imaging to facilitate accurate patient dosimetry for nuclear medicine, and an increasing need for accurate standards for radioactive waste management and nuclear forensics.

  3. Integrating measuring uncertainty of tactile and optical coordinate measuring machines in the process capability assessment of micro injection moulding

    DEFF Research Database (Denmark)

    Tosello, Guido; Hansen, Hans Nørgaard; Gasparin, Stefania

    2010-01-01

    Process capability of micro injection moulding was investigated in this paper by calculating the Cp and Cpk statistics. Uncertainty of both optical and tactile measuring systems employed in the quality control of micro injection moulded products was assessed and compared with the specified...... tolerances. Limits in terms of manufacturing process capability as well as of suitability of such measuring systems when employed for micro production inspection were quantitatively determined....

  4. [Recommendations on the metrology and the control of the quality of the critical equipments].

    Science.gov (United States)

    Daunizeau, A

    2013-06-01

    Metrology resumes activities which allow the management of results measurement quality. In this paper, we present basic principles of metrology applied to the activities of laboratory medicine. We successively treat general concepts useful for laboratory staff, the interest in the definition of a metrological function and its activities field, the applications in measuring instruments necessary for the exams of medical biology, and the specific documentation control needed.

  5. Machine learning and predictive data analytics enabling metrology and process control in IC fabrication

    Science.gov (United States)

    Rana, Narender; Zhang, Yunlin; Wall, Donald; Dirahoui, Bachir; Bailey, Todd C.

    2015-03-01

    Integrate circuit (IC) technology is going through multiple changes in terms of patterning techniques (multiple patterning, EUV and DSA), device architectures (FinFET, nanowire, graphene) and patterning scale (few nanometers). These changes require tight controls on processes and measurements to achieve the required device performance, and challenge the metrology and process control in terms of capability and quality. Multivariate data with complex nonlinear trends and correlations generally cannot be described well by mathematical or parametric models but can be relatively easily learned by computing machines and used to predict or extrapolate. This paper introduces the predictive metrology approach which has been applied to three different applications. Machine learning and predictive analytics have been leveraged to accurately predict dimensions of EUV resist patterns down to 18 nm half pitch leveraging resist shrinkage patterns. These patterns could not be directly and accurately measured due to metrology tool limitations. Machine learning has also been applied to predict the electrical performance early in the process pipeline for deep trench capacitance and metal line resistance. As the wafer goes through various processes its associated cost multiplies. It may take days to weeks to get the electrical performance readout. Predicting the electrical performance early on can be very valuable in enabling timely actionable decision such as rework, scrap, feedforward, feedback predicted information or information derived from prediction to improve or monitor processes. This paper provides a general overview of machine learning and advanced analytics application in the advanced semiconductor development and manufacturing.

  6. Development of at-wavelength metrology for x-ray optics at the ALS

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Yuan, Sheng; Celestre, Richard; McKinney, Wayne R.; Morrison, Gregory; Warwick, Tony; Padmore, Howard A.

    2010-07-09

    The comprehensive realization of the exciting advantages of new third- and forth-generation synchrotron radiation light sources requires concomitant development of reflecting and diffractive x-ray optics capable of micro- and nano-focusing, brightness preservation, and super high resolution. The fabrication, tuning, and alignment of the optics are impossible without adequate metrology instrumentation, methods, and techniques. While the accuracy of ex situ optical metrology at the Advanced Light Source (ALS) has reached a state-of-the-art level, wavefront control on beamlines is often limited by environmental and systematic alignment factors, and inadequate in situ feedback. At ALS beamline 5.3.1, we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad slope measurement accuracy for Kirkpatrick-Baez (KB) mirrors. The at-wavelength methodology we are developing relies on a series of tests with increasing accuracy and sensitivity. Geometric Hartmann tests, performed with a scanning illuminated sub-aperture determine the wavefront slope across the full mirror aperture. Shearing interferometry techniques use coherent illumination and provide higher sensitivity wavefront measurements. Combining these techniques with high precision optical metrology and experimental methods will enable us to provide in situ setting and alignment of bendable x-ray optics to realize diffraction-limited, sub 50 nm focusing at beamlines. We describe here details of the metrology beamline endstation, the x-ray beam diagnostic system, and original experimental techniques that have already allowed us to precisely set a bendable KB mirror to achieve a focused spot size of 150 nm.

  7. Hybrid enabled thin film metrology using XPS and optical

    Science.gov (United States)

    Vaid, Alok; Iddawela, Givantha; Mahendrakar, Sridhar; Lenahan, Michael; Hossain, Mainul; Timoney, Padraig; Bello, Abner F.; Bozdog, Cornel; Pois, Heath; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Kang, Byung Cheol; Isbester, Paul; Sendelbach, Matthew; Yellai, Naren; Dasari, Prasad; Larson, Tom

    2016-03-01

    Complexity of process steps integration and material systems for next-generation technology nodes is reaching unprecedented levels, the appetite for higher sampling rates is on the rise, while the process window continues to shrink. Current thickness metrology specifications reach as low as 0.1A for total error budget - breathing new life into an old paradigm with lower visibility for past few metrology nodes: accuracy. Furthermore, for advance nodes there is growing demand to measure film thickness and composition on devices/product instead of surrogate planar simpler pads. Here we extend our earlier work in Hybrid Metrology to the combination of X-Ray based reference technologies (high performance) with optical high volume manufacturing (HVM) workhorse metrology (high throughput). Our stated goal is: put more "eyes" on the wafer (higher sampling) and enable move to films on pattern structure (control what matters). Examples of 1X front-end applications are used to setup and validate the benefits.

  8. Digital holography for MEMS and microsystem metrology

    CERN Document Server

    Asundi, Anand

    2011-01-01

    Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the

  9. Combining classical metrology models

    Directory of Open Access Journals (Sweden)

    Francisco Roldán

    2013-11-01

    Full Text Available The results obtained in the graphic analysis of the modulation of the Cuarto Real de Santo Domingo building in Granada, Spain, (ROLDÁN, 2011 have provided new insights to further approach the research on possible use the double-scale in historical monumental architecture. We propose the characterization of the singularities of the system, from the implications and graphic representation required by the metrological scheme identified, as well as the variety of typologies that are presented in their modular frames, and the iterative combination of two-scale modules which allow operational approximations to fractions and ratios not explicitly present in the system.

  10. Metrology with Unknown Detectors.

    Science.gov (United States)

    Altorio, Matteo; Genoni, Marco G; Somma, Fabrizia; Barbieri, Marco

    2016-03-11

    The best possible precision is one of the key figures in metrology, but this is established by the exact response of the detection apparatus, which is often unknown. There exist techniques for detector characterization that have been introduced in the context of quantum technologies but apply as well for ordinary classical coherence; these techniques, though, rely on intense data processing. Here, we show that one can make use of the simpler approach of data fitting patterns in order to obtain an estimate of the Cramér-Rao bound allowed by an unknown detector, and we present applications in polarimetry. Further, we show how this formalism provides a useful calculation tool in an estimation problem involving a continuous-variable quantum state, i.e., a quantum harmonic oscillator.

  11. Metrology with Unknown Detectors

    CERN Document Server

    Altorio, Matteo; Somma, Fabrizia; Barbieri, Marco

    2015-01-01

    The best possible precision is one of the key figures in metrology, but this is established by the exact response of the detection apparatus, which is often unknown. There exist techniques for detector characterisation, that have been introduced in the context of quantum technologies, but apply as well for ordinary classical coherence; these techniques, though, rely on intense data processing. Here we show that one can make use of the simpler approach of data fitting patterns in order to obtain an estimate of the Cram\\'er-Rao bound allowed by an unknown detector, and present applications in polarimetry. Further, we show how this formalism provide a useful calculation tool in an estimation problem involving a continuous-variable quantum state, i.e. a quantum harmonic oscillator.

  12. Coherent Laser Radar Metrology System for Large Scale Optical Systems Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

  13. Coherent Laser Radar Metrology System for Large Scale Optical Systems Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

  14. Advanced Mathematical Tools in Metrology III

    Science.gov (United States)

    Ciarlini, P.

    The Table of Contents for the book is as follows: * Foreword * Invited Papers * The ISO Guide to the Expression of Uncertainty in Measurement: A Bridge between Statistics and Metrology * Bootstrap Algorithms and Applications * The TTRSs: 13 Oriented Constraints for Dimensioning, Tolerancing & Inspection * Graded Reference Data Sets and Performance Profiles for Testing Software Used in Metrology * Uncertainty in Chemical Measurement * Mathematical Methods for Data Analysis in Medical Applications * High-Dimensional Empirical Linear Prediction * Wavelet Methods in Signal Processing * Software Problems in Calibration Services: A Case Study * Robust Alternatives to Least Squares * Gaining Information from Biomagnetic Measurements * Full Papers * Increase of Information in the Course of Measurement * A Framework for Model Validation and Software Testing in Regression * Certification of Algorithms for Determination of Signal Extreme Values during Measurement * A Method for Evaluating Trends in Ozone-Concentration Data and Its Application to Data from the UK Rural Ozone Monitoring Network * Identification of Signal Components by Stochastic Modelling in Measurements of Evoked Magnetic Fields from Peripheral Nerves * High Precision 3D-Calibration of Cylindrical Standards * Magnetic Dipole Estimations for MCG-Data * Transfer Functions of Discrete Spline Filters * An Approximation Method for the Linearization of Tridimensional Metrology Problems * Regularization Algorithms for Image Reconstruction from Projections * Quality of Experimental Data in Hydrodynamic Research * Stochastic Drift Models for the Determination of Calibration Intervals * Short Communications * Projection Method for Lidar Measurement * Photon Flux Measurements by Regularised Solution of Integral Equations * Correct Solutions of Fit Problems in Different Experimental Situations * An Algorithm for the Nonlinear TLS Problem in Polynomial Fitting * Designing Axially Symmetric Electromechanical Systems of

  15. Operationalising the capability approach for outcome measurement in mental health research.

    Science.gov (United States)

    Simon, Judit; Anand, Paul; Gray, Alastair; Rugkåsa, Jorun; Yeeles, Ksenija; Burns, Tom

    2013-12-01

    Amartya Sen's multidimensional capability approach focuses on the importance of freedoms to be or do things people have reason to value. It is an alternative to standard utilitarian welfarism, the theoretical approach to quality-adjusted life years (QALYs) and cost-utility analyses. Despite the limitations of the utility approach in capturing non-health benefits and broader welfare inequalities, there have been very limited applications of the capability approach in the mental health context where these issues are imperative. We report the development and application of a multidimensional instrument, the OxCAP-MH, which aims to operationalise the capability approach for outcome measurement in mental health research. The study was carried out as part of an ongoing programme on community coercion experienced by service users with severe and enduring mental illness being treated using Community Treatment Orders. Capabilities data were collected at baseline in the OCTET RCT for 333 'revolving door' mental health service users who were in involuntary hospital treatment at the time of recruitment in England (2008-2011). The research focused on the identification of capabilities domains most affected by mental illness and their association with socio-demographic and clinical factors and other measures of well-being such as the EQ-5D and Global Assessment of Functioning (GAF) scales. The OxCAP-MH item response rate was 90%-68%. There were significant correlations between service users' overall capability scores and the GAF, EQ-5D VAS and EQ-5D-3L utilities (corr = 0.249, 0.514, 0.415, respectively). The most affected capability domains were: 'Daily activities', 'Influencing local decisions', 'Enjoying recreation', 'Planning one's life' and 'Discrimination'. Age had a mixed effect, while female service users and those with a primary diagnosis of schizophrenia or longer illness duration reported significantly lower capability scores. The results support the feasibility and

  16. Metrology for fire experiments in outdoor conditions

    CERN Document Server

    Silvani, Xavier

    2013-01-01

    Natural fires can be considered as scale-dependant, non-linear processes of mass, momentum and heat transport, resulting from a turbulent reactive and radiative fluid medium flowing over a complex medium, the vegetal fuel. In natural outdoor conditions, the experimental study of natural fires at real scale needs the development of an original metrology, one able to capture the large range of time and length scales involved in its dynamic nature and also able to resist the thermal, mechanical and chemical aggression of flames on devices. Robust, accurate and poorly intrusive tools must be carefully set-up and used for gaining very fluctuating data over long periods. These signals also need the development of original post-processing tools that take into account the non-steady nature of their stochastic components. Metrology for Fire Experiments in Outdoor Conditions closely analyzes these features, and also describes measurements techniques, the thermal insulation of fragile electronic systems, data acquisitio...

  17. Measuring Organizational Learning Capability in Indian Managers and Establishing Firm Performance Linkage: An Empirical Analysis

    Science.gov (United States)

    Bhatnagar, Jyotsna

    2006-01-01

    Purpose: The purpose of this research is to measure Organizational Learning Capability (OLC) perception in the managers of public, private and multinational organizations and establish the link between OLC and firm performance. Design/methodology/approach: The data were collected from a sample of 612 managers randomly drawn from Indian industry,…

  18. Capabilities for measuring physical and chemical properties of rocks at high pressure

    Energy Technology Data Exchange (ETDEWEB)

    Durham, W.B. (comp.)

    1990-01-01

    The Experimental Geophysics Group of the Earth Sciences Department at Lawrence Livermore National Laboratory (LLNL) has experimental equipment that measures a variety of physical properties and phase equilibria and kinetics on rocks and minerals at extreme pressures (to 500 GPa) and temperatures (from 10 to 2800 K). These experimental capabilities are described in this report in terms of published results, photographs, and schematic diagrams.

  19. Metrology to enable high temperature erosion testing - A new european initiative

    DEFF Research Database (Denmark)

    Fry, A.T.; Gee, M.G.; Clausen, Sønnik

    2014-01-01

    or mineral matter in oil excavation. In all cases the performance of materials can be improved through better surface engineering and coatings, but the development of these is restricted due to lack of generic models, well controlled and instrumented tests and international standards. A framework is required...... is required. However, limitations in current measurement capability within this form of test prevent the advancement. A new European initiative, METROSION, on the development of high temperature solid particle erosion testing has a primary aim to develop this metrological framework. Several key parameters...

  20. Fundamental units: physics and metrology

    CERN Document Server

    Okun, Lev Borisovich

    2003-01-01

    The problem of fundamental units is discussed in the context of achievements of both theoretical physics and modern metrology. On one hand, due to fascinating accuracy of atomic clocks, the traditional macroscopic standards of metrology (second, metre, kilogram) are giving way to standards based on fundamental units of nature: velocity of light $c$ and quantum of action $h$. On the other hand, the poor precision of gravitational constant $G$, which is widely believed to define the ``cube of theories'' and the units of the future ``theory of everything'', does not allow to use $G$ as a fundamental dimensional constant in metrology. The electromagnetic units in SI are actually based on concepts of prerelativistic classical electrodynamics such as ether, electric permitivity and magnetic permeability of vacuum. Concluding remarks are devoted to terminological confusion which accompanies the progress in basic physics and metrology.

  1. Forensic Metrology: Its Importance and Evolution in the United States

    Science.gov (United States)

    Vosk, JD Ted

    2016-11-01

    Forensic measurements play a significant role in the U.S. criminal justice system. Guilt or innocence, or the severity of a sentence, may depend upon the results of such measurements. Until recently, however, forensic disciplines were largely unaware of the field of metrology. Accordingly, proper measurement practices were often, and widely, neglected. These include failure to adopt proper calibration techniques, establish the traceability of results and determine measurement uncertainty. These failures undermine confidence in verdicts based upon forensic measurements. Over the past decade, though, the forensic sciences have been introduced to metrology and its principles leading to more reliable measurement practices. The impetus for this change was driven by many forces. Pressure came initially from criminal defense lawyers challenging metrologically unsound practices and results relied upon by government prosecutions. Litigation in the State of Washington led this movement spurring action by attorneys in other jurisdictions and eventually reform in the measurement practices of forensic labs around the country. Since then, the greater scientific community, other forensic scientists and even prosecutors have joined the fight. This paper describes the fight to improve the quality of justice by the application of metrological principles and the evolution of the field of forensic metrology.

  2. Enabling CD SEM metrology for 5nm technology node and beyond

    Science.gov (United States)

    Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

    2017-03-01

    The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with the requirements of the future technology nodes. The root causes of these challenges are not uniquely related to the shrinking CD values, as one might expect, but to the increase in complexity of the devices in terms of morphology and chemical composition as well. In fact, complicated threedimensional device architectures, high aspect ratio features, and wide variety of materials are some of the unavoidable characteristics of the future metrology nodes. This means that, beside an improvement in resolution, it is critical to develop a CD SEM metrology capable of satisfying the specific needs of the devices of the nodes to come, needs that sometimes will have to be addressed through dramatic changes in approach with respect to traditional CD SEM metrology. In this paper, we report on the development of advanced CD SEM metrology at imec on a variety of device platform and processes, for both logic and memories. We discuss newly developed approaches for standard, IIIV, and germanium FinFETs (Fin Field Effect Transistors), for lateral and vertical nanowires (NW), 3D NAND (three-dimensional NAND), STT-MRAM (Spin Transfer Magnetic Torque Random-Access Memory), and ReRAM (Resistive Random Access Memory). Applications for both front-end of line (FEOL) and back-end of line (BEOL) are developed. In terms of process, S/D Epi (Source Drain Epitaxy), SAQP (Self-Aligned Quadruple Patterning), DSA (Dynamic Self-Assembly), and EUVL (Extreme Ultraviolet Lithography) have been used. The work reported here has been performed on Hitachi CG5000, CG6300, and CV5000. In terms of logic, we discuss here the S/D epi defect classification, the metrology optimization for STI (Shallow Trench Isolation) Ge FinFETs, the defectivity of III-V STI Fin

  3. Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V.; Barber, Samuel; Domning, Edward E.; Kirschman, Jonathan L.; Morrison, Gregory Y.; Smith, Brian V.; Siewert, Frank; Zeschke, Thomas; Geckeler, Ralf; Just, Andreas

    2009-06-15

    Development of X-ray optics for 3rd and 4th generation X-ray light sources with a level of surface slope precision of 0.1-0.2 {micro}rad requires the development of adequate fabrication technologies and dedicated metrology instrumentation and methods. Currently, the best performance of surface slope measurement has been achieved with the NOM (Nanometer Optical Component Measuring Machine) slope profiler at BESSY (Germany) [1] and the ESAD (Extended Shear Angle Difference) profiler at the PTB (Germany) [2]. Both instruments are based on electronic autocollimators (AC) precisely calibrated for the specific application [3] with small apertures of 2.5-5 mm in diameter. In the present work, we describe the design, initial alignment and calibration procedures, the instrumental control and data acquisition system, as well as the measurement performance of the Developmental Long Trace Profiler (DLTP) slope measuring instrument recently brought into operation at the Advanced Light Source (ALS) Optical Metrology Laboratory (OML). Similar to the NOM and ESAD, the DLTP is based on a precisely calibrated autocollimator. However, this is a reasonably low budget instrument used at the ALS OML for the development and testing of new measuring techniques and methods. Some of the developed methods have been implemented into the ALS LTP-II (slope measuring long trace profiler [4]) which was recently upgraded and has demonstrated a capability for 0.25 {micro}rad surface metrology [5]. Performance of the DLTP was verified via a number of measurements with high quality reference mirrors. A comparison with the corresponding results obtained with the world's best slope measuring instrument, the BESSY NOM, proves the accuracy of the DLTP measurements on the level of 0.1-0.2 {micro}rad depending on the curvature of a surface under test. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.

  4. Spacetime Metrology with LISA Pathfinder

    CERN Document Server

    Congedo, Giuseppe

    2012-01-01

    LISA is the proposed ESA-NASA gravitational wave detector in the 0.1 mHz - 0.1 Hz band. LISA Pathfinder is the down-scaled version of a single LISA arm. The arm -- named Doppler link -- can be treated as a differential accelerometer, measuring the relative acceleration between test masses. LISA Pathfinder -- the in-flight test of the LISA instrumentation -- is currently in the final implementation and planned to be launched in 2014. It will set stringent constraints on the ability to put test masses in geodesic motion to within the required differential acceleration of 3\\times10^{-14} m s^{-2} Hz^{-1/2} and track their relative motion to within the required differential displacement measurement noise of 9\\times10^{-12} m Hz^{-1/2}, around 1 mHz. Given the scientific objectives, it will carry out -- for the first time with such high accuracy required for gravitational wave detection -- the science of spacetime metrology, in which the Doppler link between two free-falling test masses measures the curvature. Thi...

  5. Ocular microtremor laser speckle metrology

    Science.gov (United States)

    Al-Kalbani, M.; Mihaylova, E.; Collins, N.; Toal, V.; Coakley, D.; Boyle, G.

    2009-02-01

    Ocular Microtremor (OMT) is a continual, high frequency physiological tremor of the eye present in all subjects even when the eye is apparently at rest. OMT causes a peak to peak displacement of around 150nm-2500nm with a broadband frequency spectrum between 30Hz to 120Hz; with a peak at about 83Hz. OMT carries useful clinical information on depth of consciousness and on some neurological disorders. Nearly all quantitative clinical investigations have been based on OMT measurements using an eye contacting piezoelectric probe which has low clinical acceptability. Laser speckle metrology is a candidate for a high resolution, non-contacting, compact, portable OMT measurement technique. However, tear flow and biospeckle might be expected to interfere with the displacement information carried by the speckle. The paper investigates the properties of the scattered speckle of laser light (λ = 632.8nm) from the eye sclera to assess the feasibility of using speckle techniques to measure OMT such as the speckle correlation. The investigation is carried using a high speed CMOS video camera adequate to capture the high frequency of the tremor. The investigation is supported by studies using an eye movement simulator (a bovine sclera driven by piezoelectric bimorphs). The speckle contrast and the frame to frame spatiotemporal variations are analyzed to determine if the OMT characteristics are detectable within speckle changes induced by the biospeckle or other movements.

  6. Testing capability indices for one-sided processes with measurement errors

    Directory of Open Access Journals (Sweden)

    Grau D.

    2013-01-01

    Full Text Available In the manufacturing industry, many product characteristics are of one-sided tolerances. The process capability indices Cpu (u, v and Cpl (u, v can be used to measure process performance. Most research work related to capability indices assumes no gauge measurement errors. This assumption insufficiently reflects real situations even when advanced measuring instruments are used. In this paper we show that using a critical value without taking into account these errors, severely underestimates the α-risk which causes a less accurate testing capacity. In order to improve the results we suggest the use of an adjusted critical value, and we give a Maple program to get it. An example in a polymer granulates manufactory is presented to illustrate this approach.

  7. Absolute surface reconstruction by slope metrology and photogrammetry

    Science.gov (United States)

    Dong, Yue

    Developing the manufacture of aspheric and freeform optical elements requires an advanced metrology method which is capable of inspecting these elements with arbitrary freeform surfaces. In this dissertation, a new surface measurement scheme is investigated for such a purpose, which is to measure the absolute surface shape of an object under test through its surface slope information obtained by photogrammetric measurement. A laser beam propagating toward the object reflects on its surface while the vectors of the incident and reflected beams are evaluated from the four spots they leave on the two parallel transparent windows in front of the object. The spots' spatial coordinates are determined by photogrammetry. With the knowledge of the incident and reflected beam vectors, the local slope information of the object surface is obtained through vector calculus and finally yields the absolute object surface profile by a reconstruction algorithm. An experimental setup is designed and the proposed measuring principle is experimentally demonstrated by measuring the absolute surface shape of a spherical mirror. The measurement uncertainty is analyzed, and efforts for improvement are made accordingly. In particular, structured windows are designed and fabricated to generate uniform scattering spots left by the transmitted laser beams. Calibration of the fringe reflection instrument, another typical surface slope measurement method, is also reported in the dissertation. Finally, a method for uncertainty analysis of a photogrammetry measurement system by optical simulation is investigated.

  8. Investigation into the use of smartphone as a machine vision device for engineering metrology and flaw detection, with focus on drilling

    Science.gov (United States)

    Razdan, Vikram; Bateman, Richard

    2015-05-01

    This study investigates the use of a Smartphone and its camera vision capabilities in Engineering metrology and flaw detection, with a view to develop a low cost alternative to Machine vision systems which are out of range for small scale manufacturers. A Smartphone has to provide a similar level of accuracy as Machine Vision devices like Smart cameras. The objective set out was to develop an App on an Android Smartphone, incorporating advanced Computer vision algorithms written in java code. The App could then be used for recording measurements of Twist Drill bits and hole geometry, and analysing the results for accuracy. A detailed literature review was carried out for in-depth study of Machine vision systems and their capabilities, including a comparison between the HTC One X Android Smartphone and the Teledyne Dalsa BOA Smart camera. A review of the existing metrology Apps in the market was also undertaken. In addition, the drilling operation was evaluated to establish key measurement parameters of a twist Drill bit, especially flank wear and diameter. The methodology covers software development of the Android App, including the use of image processing algorithms like Gaussian Blur, Sobel and Canny available from OpenCV software library, as well as designing and developing the experimental set-up for carrying out the measurements. The results obtained from the experimental set-up were analysed for geometry of Twist Drill bits and holes, including diametrical measurements and flaw detection. The results show that Smartphones like the HTC One X have the processing power and the camera capability to carry out metrological tasks, although dimensional accuracy achievable from the Smartphone App is below the level provided by Machine vision devices like Smart cameras. A Smartphone with mechanical attachments, capable of image processing and having a reasonable level of accuracy in dimensional measurement, has the potential to become a handy low-cost Machine vision

  9. Measuring perceived exercise capability and investigating its relationship with childhood obesity: a feasibility study.

    Science.gov (United States)

    Taylor, M J; Arriscado, D; Vlaev, I; Taylor, D; Gately, P; Darzi, A

    2016-01-01

    According to the COM-B ('Capability', 'Opportunity', 'Motivation' and 'Behaviour') model of behaviour, three factors are essential for behaviour to occur: capability, opportunity and motivation. Obese children are less likely to feel capable of exercising. The implementation of a new methodological approach to investigate the relationship between perceived exercise capability (PEC) and childhood obesity was conducted, which involved creating a new instrument, and demonstrating how it can be used to measure obesity intervention outcomes. A questionnaire aiming to measure perceived exercise capability, opportunity and motivation was systematically constructed using the COM-B model and administered to 71 obese children (aged 9-17 years (12.24±0.2.01), body mass index (BMI) standard deviation scores (SDS) 2.80±0.660) at a weight-management camp in northern England. Scale validity and reliability was assessed. Relationships between PEC, as measured by the questionnaire, and BMI SDS were investigated for the children at the weight-management camp, and for 45 Spanish schoolchildren (aged 9-13 years, (10.52±1.23), BMI SDS 0.80±0.99). A pilot study, demonstrating how the questionnaire can be used to measure the effectiveness of an intervention aiming to bring about improved PEC for weight-management camp attendees, was conducted. No participants withdrew from these studies. The questionnaire domain (exercise capability, opportunity and motivation) composite scales were found to have adequate internal consistency (a=0.712-0.796) and construct validity (χ(2)/degrees of freedom=1.55, root mean square error of approximation=0.072, comparative fit index=0.92). Linear regression revealed that low PEC was associated with higher baseline BMI SDS for both UK (b=-0.289, P=0.010) and Spanish (b=-0.446, P=0.047) participants. Pilot study findings provide preliminary evidence for PEC improvements through intervention being achievable, and measurable using the questionnaire

  10. CSAM Metrology Software Tool

    Science.gov (United States)

    Vu, Duc; Sandor, Michael; Agarwal, Shri

    2005-01-01

    CSAM Metrology Software Tool (CMeST) is a computer program for analysis of false-color CSAM images of plastic-encapsulated microcircuits. (CSAM signifies C-mode scanning acoustic microscopy.) The colors in the images indicate areas of delamination within the plastic packages. Heretofore, the images have been interpreted by human examiners. Hence, interpretations have not been entirely consistent and objective. CMeST processes the color information in image-data files to detect areas of delamination without incurring inconsistencies of subjective judgement. CMeST can be used to create a database of baseline images of packages acquired at given times for comparison with images of the same packages acquired at later times. Any area within an image can be selected for analysis, which can include examination of different delamination types by location. CMeST can also be used to perform statistical analyses of image data. Results of analyses are available in a spreadsheet format for further processing. The results can be exported to any data-base-processing software.

  11. Study of Lever-Arm Effect Using Embedded Photogrammetry and On-Board GPS Receiver on Uav for Metrological Mapping Purpose and Proposal of a Free Ground Measurements Calibration Procedure

    Science.gov (United States)

    Daakir, M.; Pierrot-Deseilligny, M.; Bosser, P.; Pichard, F.; Thom, C.; Rabot, Y.

    2016-03-01

    Nowadays, Unmanned Aerial Vehicle (UAV) on-board photogrammetry knows a significant growth due to the democratization of using drones in the civilian sector. Also, due to changes in regulations laws governing the rules of inclusion of a UAV in the airspace which become suitable for the development of professional activities. Fields of application of photogrammetry are diverse, for instance: architecture, geology, archaeology, mapping, industrial metrology, etc. Our research concerns the latter area. Vinci-Construction- Terrassement is a private company specialized in public earthworks that uses UAVs for metrology applications. This article deals with maximum accuracy one can achieve with a coupled camera and GPS receiver system for direct-georeferencing of Digital Surface Models (DSMs) without relying on Ground Control Points (GCPs) measurements. This article focuses specially on the lever-arm calibration part. This proposed calibration method is based on two steps: a first step involves the proper calibration for each sensor, i.e. to determine the position of the optical center of the camera and the GPS antenna phase center in a local coordinate system relative to the sensor. A second step concerns a 3d modeling of the UAV with embedded sensors through a photogrammetric acquisition. Processing this acquisition allows to determine the value of the lever-arm offset without using GCPs.

  12. Optical metrology: from the laboratory to the real world

    Science.gov (United States)

    Osten, W.; Garbusi, E.; Fleischle, D.; Lyda, W.; Pruss, C.; Reichle, R.; Falldorf, C.

    2010-09-01

    Optical metrology has shown to be a versatile tool for the solution of many inspection problems. The main advantages of optical methods are the noncontact nature, the non-destructive and fieldwise working principle, the fast response, high sensitivity, resolution and accuracy. Consequently, optical principles are increasingly being considered in all steps of the evolution of modern products. However, the step out of the laboratory into the harsh environment of the factory floor was and is a big challenge for optical metrology. The advantages mentioned above must be paid often with strict requirements concerning the measurement conditions and the object under test. For instance, the request for interferometric precision in general needs an environment where high stability is guaranteed. If this cannot be satisfied to a great extent special measures have to be taken or compromises have to be accepted. But the rapid technological development of the components that are used for creating modern optical measurement systems, the unrestrained growth of the computing power and the implementation of new measurement and inspection strategies give cause for optimism and show that the high potential of optical metrology is far from being fully utilized. In this article current challenges to optical metrology are discussed and new technical improvements that help to overcome existing restrictions are treated. On example of selected applications the progress in bringing optical metrology to the real world is shown.

  13. Non-contact Displacement Sensor with Diffraction Grating Metrology System for Profile Measurement%基于衍射光栅计量系统的非接触轮廓测量位移传感器

    Institute of Scientific and Technical Information of China (English)

    黎新; 陈育荣; 王生怀

    2011-01-01

    Focus detection method is one of the non-contact profile measurement methods. However,the measurement accuracy of current focus detection method is limited by voice coil motor adopted by it. This paper presented a new non-contact displacement sensor with diffraction grating metrology system based on an improved Foucault focus detection method. Driven by a piezoelectric actuator instead of a voice coil motor, and a diffraction grating metrology system being with it, the sensor has high measurement accuracy. During surface profile sampling, according to focusing deviation signal, the focusing lens is driven to move vertically by the piezoelectric actuator so that its focus is always located on the work piece surface; synchronously the vertical displacement of the focusing lens is obtained by the diffraction grating metrology system as the profile height of sampling points. The displacements of all sampling points show the whole profile of the measured surface, which can be processed by characterization software to obtain the measurement result. The solution of this non-contact displacement sensor is 10 nm.%聚集检测法是一种非接触轮廓测量方法,但是现有的聚焦检测法采用音圈电机,其测量精度有限.针对此问题,文中提出了一种非接触位移传感器,该传感器基于改进的傅科聚焦检测法,并带有衍射光栅计量系统.通过压电驱动器取代音圈电机驱动,并配合位移计量系统,提高了传感器的测量精度.在表面轮廓采样时,根据聚焦偏差信号,压电驱动器驱动聚焦透镜作垂直运动,使焦点始终在工件表面,同时衍射光栅计量系统测得聚焦透镜的垂直位移并将其作为采样点的轮廓高度.所有采样点的位移显示出被测量表面的整个轮廓,评定软件处理这些位移数据即可获得测量结果.该非接触的位移传感器的分辨率为10 nm.

  14. A dashboard for measuring capability when designing, implementing and validating business continuity and disaster recovery projects.

    Science.gov (United States)

    Sheth, Sandesh; McHugh, Joseph; Jones, Freyae

    2008-04-01

    This paper proposes an approach for designing a business continuity management system (BCMS) dashboard constructed using resiliency capability levels. The dashboard ensures the ability to track and baseline the present capability level and focus on the activities that would help leapfrog into the higher capability levels; it also provides guidance for governance. The model is based on the building blocks of a comprehensive BCMS and SMART maturity levels (ie specific, measurable, achievable, realistic and time-bound). In terms of principles of maturity, the dashboard draws its inspiration from the Software Engineering Institute's capability maturity model. However, the commonalities end there, as the components of a BCMS are different from those of software development. This customer-centric paper addresses the need of professionals who are entrusted with developing, implementing and validating business continuity and disaster recovery plans. The paper does not address the technologies used for backing up and recovering systems, platforms, databases and applications or the contents of a business impact analysis survey, risk assessment, vital records plan, emergency response procedures, disaster recovery plans etc.

  15. Opportunities for scientists to influence policy: when does radiation metrology matter in development of national policy?

    Science.gov (United States)

    Coursey, Bert M

    2014-05-01

    Accurate measurements of radiation and radioactivity rarely rise to the level of national policy. The things that matter most to ordinary citizens do not normally include questions of science and technology. Citizens are more often concerned with issues close to home relating to commerce, health, safety, security and the environment. When questions of confidence in measurements arise, they are first directed to the ministry that has responsibilities in that area. When the required uncertainty in field measurements challenges the capability of the regulatory authorities, the National Metrology Institute may be asked to develop transfer standards to enhance the capabilities of the ministry with the mission lead. In this paper, we will consider eight instances over the past nine decades in which questions in radiation and radionuclide metrology in the US did rise to the level that they influenced decisions on national policy. These eight examples share some common threads. Radioactivity and ionizing radiation are useful tools in many disciplines, but can often represent potential or perceived threats to health and public safety. When unforeseen applications of radiation arise, or when environmental radioactivity from natural and man-made sources presents a possible health hazard, the radiation metrologists may be called upon to provide the technical underpinning for policy development.

  16. Procedure for evaluating measurement system performance: a case study

    Science.gov (United States)

    Hershey, Robert R.; Elliott, Richard C.

    1995-05-01

    This paper presents the methodology used to perform an evaluation of automated CD metrology SEMs for sub-half micron process control. The paper describes the evaluation strategy, the procedure used to collect and analyze the evaluation data and concludes with recommendations on how the procedure can be improved. The evaluation process was designed to estimate metrology capability and review specific application requirements envisioned for a leading edge semiconductor development and manufacturing facility at Motorola. The evaluation process consisted of a quantitative evaluation of measurement performance specifically examining the reproducibility, linearity, automation success rate, and throughput of the instrument. In addition, capabilities such as user interface, computer integration, job transportability, and technology roadmap were assessed qualitatively. Although a particular evaluation of automated CD SEMs is considered here, the principles used to develop the evaluation procedure can be applied to metrology tools in general. A discussion of the application and desired functionality of CD metrology instrumentation including performance criteria is presented for completeness.

  17. Statistical methods for quality assurance basics, measurement, control, capability, and improvement

    CERN Document Server

    Vardeman, Stephen B

    2016-01-01

    This undergraduate statistical quality assurance textbook clearly shows with real projects, cases and data sets how statistical quality control tools are used in practice. Among the topics covered is a practical evaluation of measurement effectiveness for both continuous and discrete data. Gauge Reproducibility and Repeatability methodology (including confidence intervals for Repeatability, Reproducibility and the Gauge Capability Ratio) is thoroughly developed. Process capability indices and corresponding confidence intervals are also explained. In addition to process monitoring techniques, experimental design and analysis for process improvement are carefully presented. Factorial and Fractional Factorial arrangements of treatments and Response Surface methods are covered. Integrated throughout the book are rich sets of examples and problems that help readers gain a better understanding of where and how to apply statistical quality control tools. These large and realistic problem sets in combination with the...

  18. Measuring Rate Capability of a Bakelite-Trigger RPC Coated with Linseed Oil

    Science.gov (United States)

    Goldberg, Leah

    2008-10-01

    The PHENIX experiment at the Relativistic Heavy Ion Collider at Brookhaven National Laboratory intends to study proton spin structure through the detection of high pT muons produced from W-Boson decay. Such measurements will require an upgrade of the first level muon trigger using Resistive Plate Chambers (RPCs). RPCs are gas detectors in which high voltage is applied across two resistive electrodes (bakelite plates) spaced 2 mm apart. The resistivity of the electrodes and possible coatings on the surface of the electrodes determine the rate capability of RPCs. We tested the performance of a double gap RPC in avalanche mode under gamma radiation from an Fe55 source. In this paper we present the rate capability of a bakelite RPC with a coating of linseed oil applied to the bakelite electrode surfaces.

  19. Dimensional quality control of Ti-Ni dental file by optical coordinate metrology and computed tomography

    DEFF Research Database (Denmark)

    Yagüe-Fabra, J.A.; Tosello, Guido; Ontiveros, S.

    2014-01-01

    Endodontic dental files usually present complex 3D geometries, which make the complete measurement of the component very challenging with conventional micro metrology tools. Computed Tomography (CT) can represent a suitable alternative solution to micro metrology tools based on optical and tactil...

  20. [The EFS metrology: From the production to the reason].

    Science.gov (United States)

    Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

    2014-06-01

    In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level.

  1. The metrology system of the VLTI instrument GRAVITY

    CERN Document Server

    Lippa, Magdalena; Blind, Nicolas; Kok, Yipting; Yazici, Senol; Weber, Johannes; Pfuhl, Oliver; Haug, Marcus; Kellner, Stefan; Wieprecht, Ekkehard; Eisenhauer, Frank; Genzel, Reinhard; Hans, Oliver; Haussmann, Frank; Huber, David; Kratschmann, Tobias; Ott, Thomas; Plattner, Markus; Rau, Christian; Sturm, Eckhard; Waisberg, Idel; Wiezorrek, Erich; Perrin, Guy; Perraut, Karine; Brandner, Wolfgang; Straubmeier, Christian; Amorim, Antonio

    2016-01-01

    The VLTI instrument GRAVITY combines the beams from four telescopes and provides phase-referenced imaging as well as precision-astrometry of order 10 microarcseconds by observing two celestial objects in dual-field mode. Their angular separation can be determined from their differential OPD (dOPD) when the internal dOPDs in the interferometer are known. Here, we present the general overview of the novel metrology system which performs these measurements. The metrology consists of a three-beam laser system and a homodyne detection scheme for three-beam interference using phase-shifting interferometry in combination with lock-in amplifiers. Via this approach the metrology system measures dOPDs on a nanometer-level.

  2. Web-Based Learning and Training for Virtual Metrology Lab

    CERN Document Server

    Al-Zahrani, Fahad

    2010-01-01

    The use of World Web Wide for distance education has received increasing attention over the past decades. The real challenge of adapting this technology for engineering education and training is to facilitate the laboratory experiments via Internet. In the sciences, measurement plays an important role. The accuracy of the measurement, as well as the units, help scientists to better understand phenomena occurring in nature. This paper introduces Metrology educators to the use and adoption of Java-applets in order to create virtual, online Metrology laboratories for students. These techniques have been used to successfully form a laboratory course which augments the more conventional lectures in concepts of Metrology course at Faculty of Engineering, Albaha University, KSA. Improvements of the package are still undergoing to incorporate Web-based technologies (Internet home page, HTML, Java programming etc...). This Web-based education and training has been successfully class-tested within an undergraduate prel...

  3. A bio-inspired real-time capable artificial lateral line system for freestream flow measurements.

    Science.gov (United States)

    Abels, C; Qualtieri, A; De Vittorio, M; Megill, W M; Rizzi, F

    2016-06-03

    To enhance today's artificial flow sensing capabilities in aerial and underwater robotics, future robots could be equipped with a large number of miniaturized sensors distributed over the surface to provide high resolution measurement of the surrounding fluid flow. In this work we show a linear array of closely separated bio-inspired micro-electro-mechanical flow sensors whose sensing mechanism is based on a piezoresistive strain-gauge along a stress-driven cantilever beam, mimicking the biological superficial neuromasts found in the lateral line organ of fishes. Aiming to improve state-of-the-art flow sensing capability in autonomously flying and swimming robots, our artificial lateral line system was designed and developed to feature multi-parameter freestream flow measurements which provide information about (1) local flow velocities as measured by the signal amplitudes from the individual cantilevers as well as (2) propagation velocity, (3) linear forward/backward direction along the cantilever beam orientation and (4) periodicity of pulses or pulse trains determined by cross-correlating sensor signals. A real-time capable cross-correlation procedure was developed which makes it possible to extract freestream flow direction and velocity information from flow fluctuations. The computed flow velocities deviate from a commercial system by 0.09 m s(-1) at 0.5 m s(-1) and 0.15 m s(-1) at 1.0 m s(-1) flow velocity for a sampling rate of 240 Hz and a sensor distance of 38 mm. Although experiments were performed in air, the presented flow sensing system can be applied to underwater vehicles as well, once the sensors are embedded in a waterproof micro-electro-mechanical systems package.

  4. A compact 45 kV curve tracer with picoampere current measurement capability

    Science.gov (United States)

    Sullivan, W. W.; Mauch, D.; Bullick, A.; Hettler, C.; Neuber, A.; Dickens, J.

    2013-03-01

    This paper discusses a compact high voltage curve tracer for high voltage semiconductor device characterization. The system sources up to 3 mA at up to 45 kV in dc conditions. It measures from 328 V to 60 kV with 15 V resolution and from 9.4 pA to 4 mA with 100 fA minimum resolution. Control software for the system is written in Microsoft Visual C# and features real-time measurement control and IV plotting, arc-protection and detection, an electrically isolated universal serial bus interface, and easy data exporting capabilities. The system has survived numerous catastrophic high voltage device-under-test arcing failures with no loss of measurement capability or system damage. Overall sweep times are typically under 2 min, and the curve tracer system was used to characterize the blocking performance of high voltage ceramic capacitors, high voltage silicon carbide photoconductive semiconductor switches, and high voltage coaxial cable.

  5. Assessment and Mission Planning Capability For Quantitative Aerothermodynamic Flight Measurements Using Remote Imaging

    Science.gov (United States)

    Horvath, Thomas; Splinter, Scott; Daryabeigi, Kamran; Wood, William; Schwartz, Richard; Ross, Martin

    2008-01-01

    High resolution calibrated infrared imagery of vehicles during hypervelocity atmospheric entry or sustained hypersonic cruise has the potential to provide flight data on the distribution of surface temperature and the state of the airflow over the vehicle. In the early 1980 s NASA sought to obtain high spatial resolution infrared imagery of the Shuttle during entry. Despite mission execution with a technically rigorous pre-planning capability, the single airborne optical system for this attempt was considered developmental and the scientific return was marginal. In 2005 the Space Shuttle Program again sponsored an effort to obtain imagery of the Orbiter. Imaging requirements were targeted towards Shuttle ascent; companion requirements for entry did not exist. The engineering community was allowed to define observation goals and incrementally demonstrate key elements of a quantitative spatially resolved measurement capability over a series of flights. These imaging opportunities were extremely beneficial and clearly demonstrated capability to capture infrared imagery with mature and operational assets of the US Navy and the Missile Defense Agency. While successful, the usefulness of the imagery was, from an engineering perspective, limited. These limitations were mainly associated with uncertainties regarding operational aspects of data acquisition. These uncertainties, in turn, came about because of limited pre-flight mission planning capability, a poor understanding of several factors including the infrared signature of the Shuttle, optical hardware limitations, atmospheric effects and detector response characteristics. Operational details of sensor configuration such as detector integration time and tracking system algorithms were carried out ad hoc (best practices) which led to low probability of target acquisition and detector saturation. Leveraging from the qualified success during Return-to-Flight, the NASA Engineering and Safety Center sponsored an

  6. Introduction to quantum metrology quantum standards and instrumentation

    CERN Document Server

    Nawrocki, Waldemar

    2015-01-01

    This book presents the theory of quantum effects used in metrology and results of the author’s own research in the field of quantum electronics. The book provides also quantum measurement standards used in many branches of metrology for electrical quantities, mass, length, time and frequency. This book represents the first comprehensive survey of quantum metrology problems. As a scientific survey, it propagates a new approach to metrology with more emphasis on its connection with physics. This is of importance for the constantly developing technologies and nanotechnologies in particular. Providing a presentation of practical applications of the effects used in quantum metrology for the construction of quantum standards and sensitive electronic components, the book is useful for a wide audience of physicists and metrologists in the broad sense of both terms. In 2014 a new system of units, the so called  Quantum SI, is introduced. This book helps to understand and approve the new system to both technology a...

  7. In-die photomask registration and overlay metrology with PROVE using 2D correlation methods

    Science.gov (United States)

    Seidel, D.; Arnz, M.; Beyer, D.

    2011-11-01

    According to the ITRS roadmap, semiconductor industry drives the 193nm lithography to its limits, using techniques like double exposure, double patterning, mask-source optimization and inverse lithography. For photomask metrology this translates to full in-die measurement capability for registration and critical dimension together with challenging specifications for repeatability and accuracy. Especially, overlay becomes more and more critical and must be ensured on every die. For this, Carl Zeiss SMS has developed the next generation photomask registration and overlay metrology tool PROVE® which serves the 32nm node and below and which is already well established in the market. PROVE® features highly stable hardware components for the stage and environmental control. To ensure in-die measurement capability, sophisticated image analysis methods based on 2D correlations have been developed. In this paper we demonstrate the in-die capability of PROVE® and present corresponding measurement results for shortterm and long-term measurements as well as the attainable accuracy for feature sizes down to 85nm using different illumination modes and mask types. Standard measurement methods based on threshold criteria are compared with the new 2D correlation methods to demonstrate the performance gain of the latter. In addition, mask-to-mask overlay results of typical box-in-frame structures down to 200nm feature size are presented. It is shown, that from overlay measurements a reproducibility budget can be derived that takes into account stage, image analysis and global effects like mask loading and environmental control. The parts of the budget are quantified from measurement results to identify critical error contributions and to focus on the corresponding improvement strategies.

  8. Quantum metrology for gravitational wave astronomy.

    Science.gov (United States)

    Schnabel, Roman; Mavalvala, Nergis; McClelland, David E; Lam, Ping K

    2010-11-16

    Einstein's general theory of relativity predicts that accelerating mass distributions produce gravitational radiation, analogous to electromagnetic radiation from accelerating charges. These gravitational waves (GWs) have not been directly detected to date, but are expected to open a new window to the Universe once the detectors, kilometre-scale laser interferometers measuring the distance between quasi-free-falling mirrors, have achieved adequate sensitivity. Recent advances in quantum metrology may now contribute to provide the required sensitivity boost. The so-called squeezed light is able to quantum entangle the high-power laser fields in the interferometer arms, and could have a key role in the realization of GW astronomy.

  9. Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

    Science.gov (United States)

    Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka

    2015-03-01

    Overlay metrology accuracy is a major concern for our industry. Advanced logic process require more tighter overlay control for multipatterning schemes. TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). Methods of compensation have been introduced, some are even very efficient to reduce these measured offsets. Another related question is about the overlay target designs. These targets are never fully representative of the design rules, strong efforts have been achieved, but the device cannot be completely duplicated. Ideally, we would like to measure in the device itself to verify the real overlay value. Top down CDSEM can measure critical dimensions of any structure, it is not dependent of specific target design. It can also measure the overlay errors but only in specific cases like LELE (Litho Etch Litho Etch) after final patterning. In this paper, we will revisit the capability of the CDSEM at final patterning by measuring overlay in dedicated targets as well as inside a logic and an SRAM design. In the dedicated overlay targets, we study the measurement differences between design rules gratings and relaxed pitch gratings. These relaxed pitch which are usually used in IBO or DBO targets. Beyond this "simple" LELE case, we will explore the capability of the CDSEM to measure overlay even if not at final patterning, at litho level. We will assess the hybridization of DBO and CDSEM for reference to optical tools after final patterning. We will show that these reference data can be used to validate the DBO overlay results (correctables and residual fingerprints).

  10. Quantum Computing, Metrology, and Imaging

    CERN Document Server

    Lee, H; Dowling, J P; Lee, Hwang; Lougovski, Pavel; Dowling, Jonathan P.

    2005-01-01

    Information science is entering into a new era in which certain subtleties of quantum mechanics enables large enhancements in computational efficiency and communication security. Naturally, precise control of quantum systems required for the implementation of quantum information processing protocols implies potential breakthoughs in other sciences and technologies. We discuss recent developments in quantum control in optical systems and their applications in metrology and imaging.

  11. Design and implementation of an x-ray strain measurement capability using a rotating anode machine

    Energy Technology Data Exchange (ETDEWEB)

    Roberts, J.A.; Rangaswamy, P.; Lujan, M. Jr.; Bourke, M.A.M.

    1998-12-31

    This is the final report of a three-year, Laboratory Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). Residual stresses close to the surface can improve the reliability and lifetime of parts for technological applications. X-ray diffraction plays a significant role in gaining an exact knowledge of the stresses at the surface and their depth distribution. An x-ray capability at Los Alamos is key to developing and maintaining industrial collaborations in strain effects. To achieve this goal, the authors implemented a residual strain measuring station on the rotating anode x-ray instrument at the Lujan Center. This capability has been used to investigate residual strains in heat treated automotive components, machining effects on titanium alloys, resistance welded steel joints, titanium matrix fiber reinforced composites, ceramic matrix composites, thin films, and ceramic coatings. The overall objective is to combine both x-ray and neutron diffraction measurements with numerical models (e.g., finite element calculations).

  12. Organs-on-Chips with combined multi-electrode array and transepithelial electrical resistance measurement capabilities.

    Science.gov (United States)

    Maoz, Ben M; Herland, Anna; Henry, Olivier Y F; Leineweber, William D; Yadid, Moran; Doyle, John; Mannix, Robert; Kujala, Ville J; FitzGerald, Edward A; Parker, Kevin Kit; Ingber, Donald E

    2017-06-27

    Here we demonstrate that microfluidic cell culture devices, known as Organs-on-a-Chips can be fabricated with multifunctional, real-time, sensing capabilities by integrating both multi-electrode arrays (MEAs) and electrodes for transepithelial electrical resistance (TEER) measurements into the chips during their fabrication. To prove proof-of-concept, simultaneous measurements of cellular electrical activity and tissue barrier function were carried out in a dual channel, endothelialized, heart-on-a-chip device containing human cardiomyocytes and a channel-separating porous membrane covered with a primary human endothelial cell monolayer. These studies confirmed that the TEER-MEA chip can be used to simultaneously detect dynamic alterations of vascular permeability and cardiac function in the same chip when challenged with the inflammatory stimulus tumor necrosis factor alpha (TNF-α) or the cardiac targeting drug isoproterenol. Thus, this Organ Chip with integrated sensing capability may prove useful for real-time assessment of biological functions, as well as response to therapeutics.

  13. Advanced Measurements of the Aggregation Capability of the MPT Network Layer Multipath Communication Library

    Directory of Open Access Journals (Sweden)

    Gábor Lencse

    2015-05-01

    Full Text Available The MPT network layer multipath communicationlibrary is a novel solution for several problems including IPv6transition, reliable data transmission using TCP, real-time transmissionusing UDP and also wireless network layer routingproblems. MPT can provide an IPv4 or an IPv6 tunnel overone or more IPv4 or IPv6 communication channels. MPT canalso aggregate the capacity of multiple physical channels. In thispaper, the channel aggregation capability of the MPT libraryis measured up to twelve 100Mbps speed channels. Differentscenarios are used: both IPv4 and IPv6 are used as the underlyingand also as the encapsulated protocols and also both UDP andTCP are used as transport protocols. In addition, measurementsare taken with both 32-bit and 64-bit version of the MPT library.In all cases, the number of the physical channels is increased from1 to 12 and the aggregated throughput is measured.

  14. Topological metrology and its application to optical position sensing

    CERN Document Server

    Tischler, Nora; Singh, Sukhwinder; Zambrana-Puyalto, Xavier; Vidal, Xavier; Brennen, Gavin; Molina-Terriza, Gabriel

    2015-01-01

    We motivate metrology schemes based on topological singularities as a way to build robustness against deformations of the system. In particular, we relate reference settings of metrological systems to topological singularities in the measurement outputs. As examples we discuss optical nano-position sensing (i) using a balanced photodetector and a quadrant photodetector, and (ii) a more general image based scheme. In both cases the reference setting is a scatterer position that corresponds to a topological singularity in an output space constructed from the scattered field intensity distributions.

  15. Langley Research Center Metrology Program status for fiscal year 1987

    Science.gov (United States)

    Kern, Frederick A.

    1988-01-01

    The status of the Langley Research Center's metrology program for fiscal year 1987 is presented. The NASA Metrology Information System, which was operational for the entire year, provided the majority of performance data describing work analysis, turnaround time, out-of-tolerance instrument data, and other instrument service data. Calibration system development, equipment replacing and updating, status of last year's planned objectives, and Reference Standard certification requirements are described. The status of the LaRC voltage and resistance measurement assurance program and the agency-wide resistance program are reviewed. Progress on fiscal year 1987 objectives is discussed and fiscal year 1988 objectives are stated.

  16. Low contact resistance in epitaxial graphene devices for quantum metrology

    Directory of Open Access Journals (Sweden)

    Tom Yager

    2015-08-01

    Full Text Available We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001 for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (<10 Ω suitable for high precision quantum resistance metrology.

  17. Low contact resistance in epitaxial graphene devices for quantum metrology

    Energy Technology Data Exchange (ETDEWEB)

    Yager, Tom, E-mail: yager@chalmers.se, E-mail: ywpark@snu.ac.kr; Lartsev, Arseniy; Lara-Avila, Samuel; Kubatkin, Sergey [Department of Microtechnology and Nanoscience, Chalmers University of Technology Göteborg, S-412 96 (Sweden); Cedergren, Karin [School of Physics, University of New South Wales, Sydney, NSW-2052 (Australia); Yakimova, Rositsa [Department of Physics, Chemistry and Biology (IFM), Linköping University Linköping, S-581 83 (Sweden); Panchal, Vishal; Kazakova, Olga [National Physical Laboratory, Teddington, TW11 0LW (United Kingdom); Tzalenchuk, Alexander [National Physical Laboratory, Teddington, TW11 0LW (United Kingdom); Department of Physics, Royal Holloway, University of London, Egham, TW20 0EX (United Kingdom); Kim, Kyung Ho; Park, Yung Woo, E-mail: yager@chalmers.se, E-mail: ywpark@snu.ac.kr [Department of Physics and Astronomy, Seoul National University, Seoul 151-747 (Korea, Republic of)

    2015-08-15

    We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (<10 Ω) suitable for high precision quantum resistance metrology.

  18. Traceability and uncertainty estimation in coordinate metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

    2001-01-01

    National and international standards have defined performance verification procedures for coordinate measuring machines (CMMs) that typically involve their ability to measure calibrated lengths and to a certain extent form. It is recognised that, without further analysis or testing, these results...... are insufficient to determine the task specific uncertainty of most measurements. Therefore, performance verification methods defined in current standards do not guarantee traceability of measurements performed with a CMM for all measurement tasks, and procedures for the assessment of task-related uncertainties...... are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

  19. METROLOGICAL PERFORMANCE OF SEM 3D TECHNIQUES

    DEFF Research Database (Denmark)

    Marinello, Francesco; Carmignato, Simone; Savio, Enrico;

    2008-01-01

    This paper addresses the metrological performance of three-dimensional measurements performed with Scanning Electron Microscopes (SEMs) using reconstruction of surface topography through stereo-photogrammetry. Reconstruction is based on the model function introduced by Piazzesi adapted for eucent...... condition are studied, in order to define a strategy to optimise the measurements taking account of the critical factors in SEM 3D reconstruction. Investigations were performed on a novel sample, specifically developed and implemented for the tests.......This paper addresses the metrological performance of three-dimensional measurements performed with Scanning Electron Microscopes (SEMs) using reconstruction of surface topography through stereo-photogrammetry. Reconstruction is based on the model function introduced by Piazzesi adapted...... and the instrument set-up; the second concerns the quality of scanned images and represents the major criticality in the application of SEMs for 3D characterizations. In particular the critical role played by the tilting angle and its relative uncertainty, the magnification and the deviations from the eucentricity...

  20. FOREWORD: Conference on Advanced Metrology for Cancer Therapy 2011 Conference on Advanced Metrology for Cancer Therapy 2011

    Science.gov (United States)

    Ankerhold, Ulrike

    2012-10-01

    Although physical treatments play a central role in cancer therapy, SI-traceable metrology has only been established for some of them. Several forms of treatment currently used (particularly intensity-modulated radiation therapy (IMRT), hadron therapy, high-intensity therapeutic ultrasound (HITU) and brachytherapy) suffer from the limited metrological support, which restricts the success of these techniques. Recognizing this deficit, the European Union identified metrology for health as one of the first four Targeted Programmes in the framework of the European Metrology Research Programme (EMRP) running from 2008 to 2011. This programme included two EMRP projects addressing metrology for cancer therapy: project T2.J06 dealing with brachytherapy project T2.J07 dealing with external beam cancer therapy using ionizing radiation and high-intensity therapeutic ultrasound. Primary measurement standards applicable to modern treatment conditions were developed under both projects, together with measurement techniques which are meant as a basis for future protocols for dosimetry, treatment planning and monitoring. In order to provide a platform for the presentation of current developments in clinical measurement techniques for cancer therapy, together with the achievements of both projects, an international Conference on Advanced Metrology for Cancer Therapy (CAMCT) was held from 29 November to 1 December 2011 at the Physikalisch-Technische Bundesanstalt (PTB) in Braunschweig, Germany. The main sessions of the conference: Primary and secondary standards of absorbed dose to water for IMRT and brachytherapy, 3D dose distributions and treatment planning for IMRT and brachytherapy, Hadron therapy (protons and carbon ions), High-intensity therapeutic ultrasound (HITU), were geared to the main foci of the projects. Metrologists and medical physicists from countries all over the world attended the conference and made it into a forum for the exchange of information and expertise

  1. Metrology Camera System Using Two-Color Interferometry

    Science.gov (United States)

    Dubovitsky, Serge; Liebe, Carl Christian; Peters, Robert; Lay, Oliver

    2007-01-01

    A metrology system that contains no moving parts simultaneously measures the bearings and ranges of multiple reflective targets in its vicinity, enabling determination of the three-dimensional (3D) positions of the targets with submillimeter accuracy. The system combines a direction-measuring metrology camera and an interferometric range-finding subsystem. Because the system is based partly on a prior instrument denoted the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor and because of its 3D capability, the system is denoted the MSTAR3D. Developed for use in measuring the shape (for the purpose of compensating for distortion) of large structures like radar antennas, it can also be used to measure positions of multiple targets in the course of conventional terrestrial surveying. A diagram of the system is shown in the figure. One of the targets is a reference target having a known, constant distance with respect to the system. The system comprises a laser for generating local and target beams at a carrier frequency; a frequency shifting unit to introduce a frequency shift offset between the target and local beams; a pair of high-speed modulators that apply modulation to the carrier frequency in the local and target beams to produce a series of modulation sidebands, the highspeed modulators having modulation frequencies of FL and FM; a target beam launcher that illuminates the targets with the target beam; optics and a multipixel photodetector; a local beam launcher that launches the local beam towards the multi-pixel photodetector; a mirror for projecting to the optics a portion of the target beam reflected from the targets, the optics being configured to focus the portion of the target beam at the multi-pixel photodetector; and a signal-processing unit connected to the photodetector. The portion of the target beam reflected from the targets produces spots on the multi-pixel photodetector corresponding to the targets, respectively, and the signal

  2. Metrology test object for dimensional verification in additive manufacturing of metals for biomedical applications.

    Science.gov (United States)

    Teeter, Matthew G; Kopacz, Alexander J; Nikolov, Hristo N; Holdsworth, David W

    2015-01-01

    Additive manufacturing continues to increase in popularity and is being used in applications such as biomaterial ingrowth that requires sub-millimeter dimensional accuracy. The purpose of this study was to design a metrology test object for determining the capabilities of additive manufacturing systems to produce common objects, with a focus on those relevant to medical applications. The test object was designed with a variety of features of varying dimensions, including holes, cylinders, rectangles, gaps, and lattices. The object was built using selective laser melting, and the produced dimensions were compared to the target dimensions. Location of the test objects on the build plate did not affect dimensions. Features with dimensions less than 0.300 mm did not build or were overbuilt to a minimum of 0.300 mm. The mean difference between target and measured dimensions was less than 0.100 mm in all cases. The test object is applicable to multiple systems and materials, tests the effect of location on the build, uses a minimum of material, and can be measured with a variety of efficient metrology tools (including measuring microscopes and micro-CT). Investigators can use this test object to determine the limits of systems and adjust build parameters to achieve maximum accuracy.

  3. Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach.

    Science.gov (United States)

    Su, Peng; Wang, Yuhao; Burge, James H; Kaznatcheev, Konstantine; Idir, Mourad

    2012-05-21

    In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision and accuracy better than 100 nrad (rms) and ~200 nrad (rms), respectively, with a lateral resolution of few mm or less. We present results of the calibration of the metrology systems, discuss their accuracy and address the precision in measuring a spherical mirror.

  4. MAMMUT: mirror vibration metrology for VLTI

    Science.gov (United States)

    Spaleniak, Izabela; Giessler, Frank; Geiss, Reinhard; Minardi, Stefano; Pertsch, Thomas; Neuhaeuser, Ralph; Becker, Martin; Rothhardt, Manfred; Delplancke, Françoise; Richichi, Andrea; Ménardi, Serge; Schmid, Christian

    2010-07-01

    MAMMUT (Mirror vibrAtion Metrolology systeM for the Unit Telescope) is an ESO funded feasibility project for the development of a fiber interferometer prototype designed for optical path laser-metrology along the optical train of the Unit Telescopes (UT) of the Very Large Telescope Interferometer (VLTI). Fast mechanical vibrations originating in the VLTI cause fast variations of the optical path difference between two arms of the stellar interferometer, thus reducing the contrast of measured interference fringes. MAMMUT aims at monitoring in real time the optical path variations inside the Coudé train of the UT, for active control purposes. MAMMUT features a 250-meter-long optical fiber which can be used to deliver and inject a laser beam at 1353 nm into the UT. The injected beam can be dropped from the telescope in the Coudé room and interfered with a phase reference, provided by the second 250-meter-long arm of the fiber interferometer. The optical path variations are measured by means of an active homodyne scheme. Coherence between the beam at the injection point and the phase reference is provided by active fiber stabilization, made possible by the implementation of an internal metrology channel in MAMMUT. Here we present the initial laboratory performance results of the MAMMUT prototype, which will be able to sense optical path variations of +/- 5 μm with sub-10 nm precision within a bandwidth of at least 100 Hz.

  5. AMS-02 Capabilities in Solar Energetic Particle Measurements for Space Weather Physics

    Science.gov (United States)

    Consolandi, Cristina; Bindi, Veronica; Corti, Claudio; Hoffman, Julia; Whitman, Kathryn

    2016-04-01

    The Alpha Magnetic Spectrometer (AMS-02), thanks to its large acceptance of about 0.45 m2 sr, is the biggest Solar Energetic Particle (SEP) detector ever flown in space. AMS-02 was installed on the International Space Station (ISS) on May 19, 2011, where it will measure cosmic rays from 1 GV up to a few TV, for the duration of the ISS, currently extended till 2024. During these years of operation, AMS-02 measured several increases of the protons flux over the Galactic Cosmic Ray (GCR) background associated to the strongest solar events. AMS-02 has observed the related SEP accelerated during M- and X-class flares and fast coronal mass ejections measuring an increase of the proton flux near 1 GV and above. Some of these solar events were also followed by the typical GCR suppression i.e. Forbush decrease, which makes even more evident the measurement of the SEP flux over the GCR background. Thanks to its large acceptance and particle detection capabilities, AMS-02 is able to perform precise measurements in a short period of time which is typical of these transient phenomena and to collect enough statistics to measure fine structures and time evolution of particle spectra. The events observed by AMS-02 since the beginning of its mission will be presented and some of the more interesting events will be shown. AMS-02 observations with their unprecedented resolution and high statistics, will improve the understanding of SEP behavior at high energies to constrain models of SEP production used in space weather physics.

  6. Using Vision Metrology System for Quality Control in Automotive Industries

    Science.gov (United States)

    Mostofi, N.; Samadzadegan, F.; Roohy, Sh.; Nozari, M.

    2012-07-01

    The need of more accurate measurements in different stages of industrial applications, such as designing, producing, installation, and etc., is the main reason of encouraging the industry deputy in using of industrial Photogrammetry (Vision Metrology System). With respect to the main advantages of Photogrammetric methods, such as greater economy, high level of automation, capability of noncontact measurement, more flexibility and high accuracy, a good competition occurred between this method and other industrial traditional methods. With respect to the industries that make objects using a main reference model without having any mathematical model of it, main problem of producers is the evaluation of the production line. This problem will be so complicated when both reference and product object just as a physical object is available and comparison of them will be possible with direct measurement. In such case, producers make fixtures fitting reference with limited accuracy. In practical reports sometimes available precision is not better than millimetres. We used a non-metric high resolution digital camera for this investigation and the case study that studied in this paper is a chassis of automobile. In this research, a stable photogrammetric network designed for measuring the industrial object (Both Reference and Product) and then by using the Bundle Adjustment and Self-Calibration methods, differences between the Reference and Product object achieved. These differences will be useful for the producer to improve the production work flow and bringing more accurate products. Results of this research, demonstrate the high potential of proposed method in industrial fields. Presented results prove high efficiency and reliability of this method using RMSE criteria. Achieved RMSE for this case study is smaller than 200 microns that shows the fact of high capability of implemented approach.

  7. Enabling Quantitative Optical Imaging for In-die-capable Critical Dimension Targets

    Science.gov (United States)

    Barnes, B.M.; Henn, M.-A.; Sohn, M. Y.; Zhou, H.; Silver, R. M.

    2017-01-01

    Dimensional scaling trends will eventually bring semiconductor critical dimensions (CDs) down to only a few atoms in width. New optical techniques are required to address the measurement and variability for these CDs using sufficiently small in-die metrology targets. Recently, Qin et al. [Light Sci Appl, 5, e16038 (2016)] demonstrated quantitative model-based measurements of finite sets of lines with features as small as 16 nm using 450 nm wavelength light. This paper uses simulation studies, augmented with experiments at 193 nm wavelength, to adapt and optimize the finite sets of features that work as in-die-capable metrology targets with minimal increases in parametric uncertainty. A finite element based solver for time-harmonic Maxwell's equations yields two- and three-dimensional simulations of the electromagnetic scattering for optimizing the design of such targets as functions of reduced line lengths, fewer number of lines, fewer focal positions, smaller critical dimensions, and shorter illumination wavelength. Metrology targets that exceeded performance requirements are as short as 3 μm for 193 nm light, feature as few as eight lines, and are extensible to sub-10 nm CDs. Target areas measured at 193 nm can be fifteen times smaller in area than current state-of-the-art scatterometry targets described in the literature. This new methodology is demonstrated to be a promising alternative for optical model-based in-die CD metrology. PMID:28757674

  8. Incoming Metrology of Segmented X-Ray Mandrels at MSFC

    Science.gov (United States)

    Gubarev, Mikhail; ODell, Steve; Kester, Thomas; Lehner, David; Jones, William; Smithers, Martin

    2004-01-01

    The Constellation-X Spectroscopy X-ray telescope (SXT) is designed to be built from X-ray optic segments. The X-ray segments will be fabricated from the segmented mandrels using a replication process. The purpose of the incoming metrology is to map the surface of the mandrels, so the performance of the X-ray optics produced can be predicted. Three Constellation-X segmented mandrels have been delivered to MSFC for incoming metrology. The segmented mandrels are 30-degree sections of a cylindrical surface and have diameters of 1.0 m, 1.2 m and 1.6 m. The maximum dimensions of the optical surface are 1.0 m axial length and 0.5 m azimuthal segment length. The metrology of the mandrels consists of the measurement of their slope differences, roundness, absolute radius, axial profile and microroughness. Accuracy goals for each type of measurement and the accuracy of the instruments used for the measurements will be discussed. The results of the mandrel metrology together with the performance predictions will be presented.

  9. A new approach to stitching optical metrology data

    Science.gov (United States)

    King, Christopher W.

    The next generation of optical instruments, including telescopes and imaging apparatus, will generate an increased requirement for larger and more complex optical forms. A major limiting factor for the production of such optical components is the metrology: how do we measure such parts and with respect to what reference datum This metrology can be thought of as part of a complete cycle in the production of optical components and it is currently the most challenging aspect of production. This thesis investigates a new and complete approach to stitching optical metrology data to extend the effective aperture or, in future, the dynamic range of optical metrology instruments. A practical approach is used to build up a complete process for stitching on piano and spherical parts. The work forms a basis upon which a stitching system for aspheres might be developed in the future, which is inherently more complicated. Beginning with a historical perspective and a review of optical polishing and metrology, the work presented relates the commercially available metrology instruments to the stitching process developed. The stitching is then performed by a numerical optimization routine that seeks to join together overlapping sub-aperture measurements by consideration of the aberrations introduced by the measurement scenario, and by the overlap areas between measurements. The stitching is part of a larger project, the PPARC Optical Manipulation and Metrology project, and was to benefit from new wavefront sensing technology developed by a project partner, and to be used for the sub-aperture measurement. Difficult mathematical problems meant that such a wavefront sensor was not avail able for this work and a work-around was therefore developed using commercial instruments. The techniques developed can be adapted to work on commercial ma chine platforms, and in partuicular, the OMAM NPL/UCL swing-arm profilometer described in chapter 5, or the computer controlled polishing machines

  10. Quantum resistance metrology using graphene.

    Science.gov (United States)

    Janssen, T J B M; Tzalenchuk, A; Lara-Avila, S; Kubatkin, S; Fal'ko, V I

    2013-10-01

    In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

  11. Assessing quality of life among British older people using the ICEPOP CAPability (ICECAP-O) measure.

    Science.gov (United States)

    Flynn, Terry N; Chan, Phil; Coast, Joanna; Peters, Tim J

    2011-09-01

    The Investigating Choice Experiments for the Preferences of Older People (ICEPOP) programme developed a capability-based measure of general quality of life (QOL): the ICEPOP CAPability (ICECAP-O) instrument. ICECAP-O was originally intended for use in the economic evaluation of health and social care interventions, but there is increasing interest in using it to quantify differences in QOL in cross-sectional data. The objective of this study was to assess the construct validity of the overall ICECAP-O scores and quantify differences in QOL associated with various factors in a multivariable regression model among residents of a British city. ICECAP-O was administered as part of a survey of 4304 citizens of a British city. QOL values in only those respondents aged ≥65 years (n = 809) were compared across subgroups using univariable analyses and multivariable regression models. QOL values were associated with differences in responses to a variety of questions about respondents' socioeconomic status, locality, contact with others, participation, health and social support. Multivariable regression results showed that poor physical and psychological health were associated with 4-7% lower QOL. Living alone and infrequent socializing were each associated with an approximately 2.5% impairment in QOL. Feeling unsafe after dark was associated with an 8% impairment, whilst those without a faith experienced 5% lower QOL on average. Distribution of ICECAP-O values by electoral ward enabled the identification of areas of deprivation, although the associations were strong only for enjoyment and control. ICECAP-O provides policy makers with robust quantitative evidence of differences in QOL. It offers local government an opportunity to evaluate the effects of health and other interventions, and to make comparisons across sectors for which it is responsible. It also demonstrates good ability to compare impairments in QOL associated with sociodemographic, health and attitudinal

  12. Metrology for Information Technology

    Science.gov (United States)

    1997-05-01

    unit. As Ellis states, "If we must speak of counting as a measuring procedure, it is unique among all measuring procedures." Carnap claims that...actual state of the world. However, probability is understood in another sense: as "degree of confirmation." Carnap ° claims that the term...Rudolf Carnap , Philosophical Foundations of Physics. Basic Books: New York. 1996. 6. Karel Berka, Measurement: Its Concepts, Theories and Problems. D

  13. UPWIND 1A2 Metrology. Final Report

    DEFF Research Database (Denmark)

    Eecen, P.J.; Wagenaar, J.W.; Stefanatos, N.

    The UpWind project is a European research project that focuses on the necessary up-scaling of wind energy in 2020. Among the problems that hinder the development of wind energy are measurement problems. For example: to experimentally confirm a theoretical improvement in energy production of a few...... percent of a new design by field experiments is very hard to almost impossible. As long as convincing field tests have not confirmed the actual improvement, the industry will not invest much to change the turbine design. This is an example that clarifies why the development of wind energy is hindered...... by metrology problems (measurement problems). Other examples are in the fields of: • Warranty performance measurements • Improvement of aerodynamic codes • Assessment of wind resources In general terms the uncertainties of the testing techniques and methods are typically much higher than the requirements...

  14. THE PROCESS CAPABILITY ANALYSIS - A TOOL FOR PROCESS PERFORMANCE MEASURES AND METRICS - A CASE STUDY

    Directory of Open Access Journals (Sweden)

    Yerriswamy Wooluru

    2014-09-01

    Full Text Available Process Capability can be evaluated through the computations of various process capability ratios and indices. The basic three capability indices commonly used in manufacturing industries are Cp, Cpk, Cpm and Cpmk .Process capability indices are intended to provide single number assessment of the ability of a process to meet specification limits on quality characteristics of interest. Thus, it identifies the opportunities for improving quality and productivity. The level of significance on process capability analysis has been increased considerably over last decade, but the literature findings reveal the importance of understanding the concepts, methodologies and critical assumptions while its implementation in manufacturing process. The objective of this paper is to conduct process capability analysis for boring operation by understanding the concepts, methodologies and making critical assumptions.

  15. At-wavelength Optical Metrology Development at the ALS

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Sheng Sam; Goldberg, Kenneth A.; Yashchuk, Valeriy V.; Celestre, Richard; Mochi, Iacopo; Macdougall, James; Morrison, Gregory Y.; Smith, Brian V.; Domning, Edward E.; McKinney, Wayne R.; Warwick, Tony

    2010-07-19

    Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

  16. Predictability of the geospace variations and measuring the capability to model the state of the system

    Science.gov (United States)

    Pulkkinen, A.

    2012-12-01

    Empirical modeling has been the workhorse of the past decades in predicting the state of the geospace. For example, numerous empirical studies have shown that global geoeffectiveness indices such as Kp and Dst are generally well predictable from the solar wind input. These successes have been facilitated partly by the strongly externally driven nature of the system. Although characterizing the general state of the system is valuable and empirical modeling will continue playing an important role, refined physics-based quantification of the state of the system has been the obvious next step in moving toward more mature science. Importantly, more refined and localized products are needed also for space weather purposes. Predictions of local physical quantities are necessary to make physics-based links to the impacts on specific systems. As we have introduced more localized predictions of the geospace state one central question is how predictable these local quantities are? This complex question can be addressed by rigorously measuring the model performance against the observed data. Space sciences community has made great advanced on this topic over the past few years and there are ongoing efforts in SHINE, CEDAR and GEM to carry out community-wide evaluations of the state-of-the-art solar and heliospheric, ionosphere-thermosphere and geospace models, respectively. These efforts will help establish benchmarks and thus provide means to measure the progress in the field analogous to monitoring of the improvement in lower atmospheric weather predictions carried out rigorously since 1980s. In this paper we will discuss some of the latest advancements in predicting the local geospace parameters and give an overview of some of the community efforts to rigorously measure the model performances. We will also briefly discuss some of the future opportunities for advancing the geospace modeling capability. These will include further development in data assimilation and ensemble

  17. TNO TPD contributions to high precision optical metrology, a Darwin metrology breadboard for ESA

    NARCIS (Netherlands)

    Verlaan, A.L.; Dool, T.C. van den; Braam, B.C.; Calvel, B.; Sesselman, R.; Pöschel, W.; Dontsov, D.; Vega, I.C.; Manske, E.; Schuldt, T.; Sodnik, Z.

    2004-01-01

    A Darwin precursor breadboard, comprising both fine lateral and longitudinal metrology sensors was designed, built and partially tested. The lateral metrology sensor was designed and built by TNO TPD and more than meets the imposed requirements. The longitudinal metrology sensor consists of a dual

  18. TNO TPD contributions to high precision optical metrology, a Darwin metrology breadboard for ESA

    NARCIS (Netherlands)

    Verlaan, A.L.; Dool, T.C. van den; Braam, B.C.; Calvel, B.; Sesselman, R.; Pöschel, W.; Dontsov, D.; Vega, I.C.; Manske, E.; Schuldt, T.; Sodnik, Z.

    2004-01-01

    A Darwin precursor breadboard, comprising both fine lateral and longitudinal metrology sensors was designed, built and partially tested. The lateral metrology sensor was designed and built by TNO TPD and more than meets the imposed requirements. The longitudinal metrology sensor consists of a dual w

  19. Quality assurance of the measurements of the activity conducted by the Brazilian Lab of Ionizing Radiation Metrology of the Instituto de Radioprotecao e Dosimetria, Rio de Janeiro, RJ, Brazil; Garantia da qualidade das medicoes da grandeza atividade realizadas pelo Laboratorio Nacional de Metrologia das Radiacoes Ionizantes - Instituto de Radioprotecao e Dosimetria

    Energy Technology Data Exchange (ETDEWEB)

    Silva, Carlos J. da; Delgado, Jose U.; Iwahara, Akira; Bernardes, Estela Maria O.; Prinzio, Maria Antonieta R. de; Oliveira, Antonio Eduardo de; Poledna, Roberto; Lopes, Ricardo Tadeu [Instituto de Radioprotecao e Dosimetria (IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil)

    2005-07-01

    Measuring systems with reentrant type ionization chamber, has been used as reference systems for storing results of international intercomparisons, these systems offer great stability over several years and absolute methods comparable to those uncertainties. This work are presented the calibration factors of a well-type ionization chamber and their uncertainties, the standardization of various radionuclides which present metrological traceability ensured by key comparisons organized by the International Bureau of Weights and Measures.

  20. Metrology for Chemical Engineers

    DEFF Research Database (Denmark)

    Heydorn, Kaj; Hansen, Elo Harald

    2001-01-01

    of Measurement Methods and Results. The main purpose of the course was, however. to familiarize PhD students with the BIPM philosophy, using the International Organization for Standardization (ISO) Guide to Expression of Uncertainty in Measurement, which was accepted by IUPAC and other international scientific...... of the analytical method. The paper presents the detailed structure of this first course. as well as improvements in the next course scheduled for the year 2000....

  1. Advanced applications of scatterometry based optical metrology

    Science.gov (United States)

    Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

    2017-03-01

    The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements

  2. Fluoride sample matrices and reaction cells — new capabilities for isotope measurements in accelerator mass spectrometry

    Directory of Open Access Journals (Sweden)

    Eliades J.

    2012-04-01

    Full Text Available Two new techniques, which extend the range of elements that can be analyzed by Accelerator Mass Spectrometry (AMS, and which increase its isobar selection capabilities, have been recently introduced. The first consists of embedding the sample material in a fluoride matrix (e.g. PbF2, which facilitates the production, in the ion source, of fluoride molecular anions that include the isotope of interest. In addition to forming anions with large electron binding energies and thereby increasing the range of analysable elements, in many cases by selection of a molecular form with a particular number of fluorine atoms, some isobar discrimination can be obtained. The second technique, for the significant reduction of atomic isobar interferences, is used following mass selection of the rare isotope. It consists of the deceleration, cooling and reaction of the rare mass beam with a gas, selected so that unwanted isobars are greatly attenuated in comparison with the isotope of interest. Proof of principle measurements for the analysis of 36C1 and 41Ca have provided encouraging results and work is proceeding on the integration of these techniques in a new AMS system planned for installation in late 2012 at the University of Ottawa.

  3. Enhacement of intrafield overlay using a design based metrology system

    Science.gov (United States)

    Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun

    2016-03-01

    As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.

  4. Fiscal Year 2005 Solar Radiometry and Metrology Task Accomplishments

    Energy Technology Data Exchange (ETDEWEB)

    Myers, D.; Andreas, A.; Reda, I.; Gotseff, P.; Wilcox, S.; Stoffel, T.; Anderberg, M.; Kay, B.; Bowen, A.

    2005-11-01

    The National Renewable Energy Laboratory (NREL) Solar Radiometry and Metrology task provides traceable optical radiometric calibrations and measurements to photovoltaic (PV) researchers and the PV industry. Traceability of NREL solar radiometer calibrations to the World Radiometric Reference (WRR) was accomplished during Pyrheliometer Comparison at NREL in October 2004. Ten spectral and more than 200 broadband radiometers for solar measurements were calibrated this year. We measured detailed spectral distributions of the NREL and PV industry Pulsed Solar Simulators and are analyzing the influence of environmental variables on radiometer uncertainty. New systems for indoor and outdoor solar radiometer calibrations and ultraviolet (UV) spectral measurements and UV radiometer calibrations were purchased and tested. Optical metrology functions support the NREL Measurement and Characterization Task effort for ISO 17025 accreditation of NREL Solar Reference Cell Calibrations and have been integrated into the NREL quality system and audited for ISO17025 compliance.

  5. The metrology of time.

    Science.gov (United States)

    Arias, Elisa Felicitas

    2005-09-15

    Measuring time is a continuous activity, an international and restless enterprise hidden in time laboratories spread all over the planet. The Bureau International des Poids et Mesures is charged with coordinating activities for international timekeeping and it makes use of the world's capacity to produce a remarkably stable and accurate reference time-scale. Commercial atomic clocks beating the second in national laboratories can reach a stability of one part in 10(14) over a 5 day averaging time, compelling us to research the most highly performing methods of remote clock comparison. The unit of the international time-scale is the second of the International System of Units, realized with an uncertainty of the order 10(-15) by caesium fountains. Physicists in a few time laboratories are making efforts to gain one order of magnitude in the uncertainty of the realization of the second, and more refined techniques of time and frequency transfer are in development to accompany this progress. Femtosecond comb technology will most probably contribute in the near future to enhance the definition of the second with the incorporation of optical clocks. We will explain the evolution of the measuring of time, current state-of-the-art measures and future challenges.

  6. Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

    Science.gov (United States)

    Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

    2016-12-01

    The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

  7. Dimensional Metrology for Microtechnology

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2005-01-01

    of the (large) CMM positioning errors. A geometrical (three dimensional) model, for the Large range AFM was produced and calibration issues discussed following the three dimensional approach. Furthermore, a novel measuring procedure, based on two images, for eliminating the effects of vertical drift...... of one percent, with this instrument. Uncertainty is dominated by residual non linearity after off line correction. SEM based stereo-photogrammetry was also studied. A commercially available software package was purchased. The working hypothesis for the package in use was eucentric tilting. This is only...

  8. Entanglement and Metrology with Singlet-Triplet Qubits

    Science.gov (United States)

    Shulman, Michael Dean

    nuclear magnetic field control, as well as new techniques for calibrated measurement of the density matrix in a singlet-triplet qubit to entangle two adjacent single-triplet qubits. We fully characterize the generated entangled states and prove that they are, indeed, entangled. This work opens new opportunities to use qubits as sensors for improved metrological capabilities, as well as for improved quantum information processing. The singlet-triplet qubit is unique in that it can be used to probe two fundamentally different noise baths, which are important for a large variety of solid state qubits. More specifically, this work establishes the singlet-triplet qubit as a viable candidate for the building block of a scalable quantum information processor.

  9. Comparison of two metrological approaches for the prediction of human haptic perception

    Science.gov (United States)

    Neumann, Annika; Frank, Daniel; Vondenhoff, Thomas; Schmitt, Robert

    2016-06-01

    Haptic perception is regarded as a key component of customer appreciation and acceptance for various products. The prediction of customers’ haptic perception is of interest both during product development and production phases. This paper presents the results of a multivariate analysis between perceived roughness and texture related surface measurements, to examine whether perceived roughness can be accurately predicted using technical measurements. Studies have shown that standardized measurement parameters, such as the roughness coefficients (e.g. Rz or Ra), do not show a one-dimensional linear correlation with the human perception (of roughness). Thus, an alternative measurement method was compared to standard measurements of roughness, in regard to its capability of predicting perceived roughness through technical measurements. To estimate perceived roughness, an experimental study was conducted in which 102 subjects evaluated four sets of 12 different geometrical surface structures regarding their relative perceived roughness. The two different metrological procedures were examined in relation to their capability to predict the perceived roughness of the subjects stated within the study. The standardized measurements of the surface roughness were made using a structured light 3D-scanner. As an alternative method, surface induced vibrations were measured by a finger-like sensor during robot-controlled traverse over a surface. The presented findings provide a better understanding of the predictability of human haptic perception using technical measurements.

  10. Physical characterization and performance evaluation of an x-ray micro-computed tomography system for dimensional metrology applications

    DEFF Research Database (Denmark)

    Hiller, Jochen; Maisl, Michael; Reindl, Leonard M

    2012-01-01

    This paper presents physical and metrological characterization measurements conducted for an industrial x-ray micro-computed tomography (CT) system. As is well known in CT metrology, many factors, e.g., in the scanning and reconstruction process, the image processing, and the 3D data evaluation...

  11. Loschmidt echo for quantum metrology

    Science.gov (United States)

    Macrı, Tommaso; Smerzi, Augusto; Pezzè, Luca

    2016-07-01

    We propose a versatile Loschmidt echo protocol to detect and quantify multiparticle entanglement. It allows us to extract the quantum Fisher information for arbitrary pure states, and finds direct application in quantum metrology. In particular, the protocol applies to states that are generally difficult to characterize, as non-Gaussian states, and states that are not symmetric under particle exchange. We focus on atomic systems, including trapped ions, polar molecules, and Rydberg atoms, where entanglement is generated dynamically via long-range interaction, and show that the protocol is stable against experimental detection errors.

  12. Maximum information photoelectron metrology

    CERN Document Server

    Hockett, P; Wollenhaupt, M; Baumert, T

    2015-01-01

    Photoelectron interferograms, manifested in photoelectron angular distributions (PADs), are a high-information, coherent observable. In order to obtain the maximum information from angle-resolved photoionization experiments it is desirable to record the full, 3D, photoelectron momentum distribution. Here we apply tomographic reconstruction techniques to obtain such 3D distributions from multiphoton ionization of potassium atoms, and fully analyse the energy and angular content of the 3D data. The PADs obtained as a function of energy indicate good agreement with previous 2D data and detailed analysis [Hockett et. al., Phys. Rev. Lett. 112, 223001 (2014)] over the main spectral features, but also indicate unexpected symmetry-breaking in certain regions of momentum space, thus revealing additional continuum interferences which cannot otherwise be observed. These observations reflect the presence of additional ionization pathways and, most generally, illustrate the power of maximum information measurements of th...

  13. Ionising radiation metrology for the metallurgical industry

    Directory of Open Access Journals (Sweden)

    García-Toraño E.

    2014-01-01

    Full Text Available Every year millions tons of steel are produced worldwide from recycled scrap loads. Although the detection systems in the steelworks prevent most orphan radioactive sources from entering the furnace, there is still the possibility of accidentally melting a radioactive source. The MetroMetal project, carried out in the frame of the European Metrology Research Programme (EMRP, addresses this problem by studying the existing measurement systems, developing sets of reference sources in various matrices (cast steel, slag, fume dust and proposing new detection instruments. This paper presents the key lines of the project and describes the preparation of radioactive sources as well as the intercomparison exercises used to test the calibration and correction methods proposed within the project.

  14. The research progress of metrological 248nm deep ultraviolent microscope inspection device

    Science.gov (United States)

    Wang, Zhi-xin; Li, Qi; Gao, Si-tian; Shi, Yu-shu; Li, Wei; Li, Shi

    2016-01-01

    In lithography process, the precision of wafer pattern to a large extent depends on the geometric dimensioning and tolerance of photomasks when accuracy of lithography aligner is certain. Since the minimum linewidth (Critical Dimension) of the aligner exposing shrinks to a few tens of nanometers in size, one-tenth of tolerance errors in fabrication may lead to microchip function failure, so it is very important to calibrate these errors of photomasks. Among different error measurement instruments, deep ultraviolent (DUV) microscope because of its high resolution, as well as its advantages compared to scanning probe microscope restrained by measuring range and scanning electron microscope restrained by vacuum environment, makes itself the most suitable apparatus. But currently there is very few DUV microscope adopting 248nm optical system, means it can attain 80nm resolution; furthermore, there is almost no DUV microscope possessing traceable calibration capability. For these reason, the National Institute of Metrology, China is developing a metrological 248nm DUV microscope mainly consists of DUV microscopic components, PZT and air supporting stages as well as interferometer calibration framework. In DUV microscopic component, the Köhler high aperture transmit condenser, DUV splitting optical elements and PMT pinhole scanning elements are built. In PZT and air supporting stages, a novel PZT actuating flexural hinge stage nested separate X, Y direction kinematics and a friction wheel driving long range air supporting stage are researched. In interferometer framework, a heterodyne multi-pass interferometer measures XY axis translation and Z axis rotation through Zerodur mirror mounted on stage. It is expected the apparatus has the capability to calibrate one dimensional linewidths and two dimensional pitches ranging from 200nm to 50μm with expanded uncertainty below 20nm.

  15. Applications of surface metrology in firearm identification

    Science.gov (United States)

    Zheng, X.; Soons, J.; Vorburger, T. V.; Song, J.; Renegar, T.; Thompson, R.

    2014-01-01

    Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCFMAX) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases.

  16. Information systems as a tool to improve legal metrology activities

    Science.gov (United States)

    Rodrigues Filho, B. A.; Soratto, A. N. R.; Gonçalves, R. F.

    2016-07-01

    This study explores the importance of information systems applied to legal metrology as a tool to improve the control of measuring instruments used in trade. The information system implanted in Brazil has also helped to understand and appraise the control of the measurements due to the behavior of the errors and deviations of instruments used in trade, allowing the allocation of resources wisely, leading to a more effective planning and control on the legal metrology field. A study case analyzing the fuel sector is carried out in order to show the conformity of fuel dispersers according to maximum permissible errors. The statistics of measurement errors of 167,310 fuel dispensers of gasoline, ethanol and diesel used in the field were analyzed demonstrating the accordance of the fuel market in Brazil to the legal requirements.

  17. Metrology to enable high temperature erosion testing - A new european initiative

    DEFF Research Database (Denmark)

    Fry, A.T.; Gee, M.G.; Clausen, Sønnik

    2014-01-01

    or mineral matter in oil excavation. In all cases the performance of materials can be improved through better surface engineering and coatings, but the development of these is restricted due to lack of generic models, well controlled and instrumented tests and international standards. A framework is required...... therefore that can be applied to these different situations to characterise the high temperature erosion performance of new materials and coatings and thereby accelerate their development and design. To achieve this, a step change in the test methods and control of high temperature solid particle erosion...... is required. However, limitations in current measurement capability within this form of test prevent the advancement. A new European initiative, METROSION, on the development of high temperature solid particle erosion testing has a primary aim to develop this metrological framework. Several key parameters...

  18. A Cryogenic Radiometry Based Spectral Responsivity Scale at the National Metrology Centre

    Science.gov (United States)

    Xu, Gan; Huang, Xuebo

    This paper describes the spectral responsivity scale established at the National Metrology Centre (NMC) based on cryogenic radiometry. A primary standard - a mechanically pumped cryogenic radiometer together with a set of intensity-stabilised lasers provides traceability for optical power measurement with an uncertainty in the order of 10-4 at 14 discrete wavelengths in the spectral range from 350 nm to 800 nm. A silicon trap detector, with its absolute responsivity calibrated against the cryogenic radiometer is used as a transfer standard for the calibration of other detectors using a specially built spectral comparator. The relative spectral responsivity of a detector at other wavelengths can be determined through the use of a cavity pyroelectric detector and the extrapolation technique. With this scale, NMC is capable to calibrate the spectral responsivity of different type of photo detectors from 250 nm to 1640 nm with an uncertainty range from 3.7% to 0.3%.

  19. Thermal Properties Capability Development Workshop Summary to Support the Implementation Plan for PIE Thermal Conductivity Measurements

    Energy Technology Data Exchange (ETDEWEB)

    Braase, Lori [Idaho National Lab. (INL), Idaho Falls, ID (United States); Papesch, Cynthia [Idaho National Lab. (INL), Idaho Falls, ID (United States); Hurley, David [Idaho National Lab. (INL), Idaho Falls, ID (United States)

    2015-04-01

    The Department of Energy (DOE)-Office of Nuclear Energy (NE), Idaho National Laboratory (INL), and associated nuclear fuels programs have invested heavily over the years in infrastructure and capability development. With the current domestic and international need to develop Accident Tolerant Fuels (ATF), increasing importance is being placed on understanding fuel performance in irradiated conditions and on the need to model and validate that performance to reduce uncertainty and licensing timeframes. INL’s Thermal Properties Capability Development Workshop was organized to identify the capability needed by the various nuclear programs and list the opportunities to meet those needs. In addition, by the end of fiscal year 2015, the decision will be made on the initial thermal properties instruments to populate the shielded cell in the Irradiated Materials Characterization Laboratory (IMCL).

  20. Metrology of Large Parts. Chapter 5

    Science.gov (United States)

    Stahl, H. Philip

    2012-01-01

    As discussed in the first chapter of this book, there are many different methods to measure a part using optical technology. Chapter 2 discussed the use of machine vision to measure macroscopic features such as length and position, which was extended to the use of interferometry as a linear measurement tool in chapter 3, and laser or other trackers to find the relation of key points on large parts in chapter 4. This chapter looks at measuring large parts to optical tolerances in the sub-micron range using interferometry, ranging, and optical tools discussed in the previous chapters. The purpose of this chapter is not to discuss specific metrology tools (such as interferometers or gauges), but to describe a systems engineering approach to testing large parts. Issues such as material warpage and temperature drifts that may be insignificant when measuring a part to micron levels under a microscope, as will be discussed in later chapters, can prove to be very important when making the same measurement over a larger part. In this chapter, we will define a set of guiding principles for successfully overcoming these challenges and illustrate the application of these principles with real world examples. While these examples are drawn from specific large optical testing applications, they inform the problems associated with testing any large part to optical tolerances. Manufacturing today relies on micrometer level part performance. Fields such as energy and transportation are demanding higher tolerances to provide increased efficiencies and fuel savings. By looking at how the optics industry approaches sub-micrometer metrology, one can gain a better understanding of the metrology challenges for any larger part specified to micrometer tolerances. Testing large parts, whether optical components or precision structures, to optical tolerances is just like testing small parts, only harder. Identical with what one does for small parts, a metrologist tests large parts and optics

  1. Capabilities of the DOE Remote Sensing Laboratory`s aerial measuring system

    Energy Technology Data Exchange (ETDEWEB)

    Riedhauser, S.R.

    1995-09-01

    This report describes the capabilities of the Remote Sensing Laboratory`s aircraft for use in environmental radiation surveys, multispectral (visible, near infrared, and thermal infrared) surveys of vegetation and buildings, and photographic documentation of the areas covered by the two other surveys. The report discusses the technical capabilities of the various systems and presents examples of the data from a recent demonstration survey. To provide a view of the types of surveys the Remote Sensing Laboratory has conducted in the past, the appendices describe several of the previous area surveys and emergency search surveys.

  2. Distance-dependent influences on angle metrology with autocollimators in deflectometry

    Science.gov (United States)

    Geckeler, Ralf D.; Just, Andreas

    2008-08-01

    The application of electronic autocollimators to the deflectometric measurement of synchrotron optics in beamline metrology laboratories is steadily increasing. The main reason for this is the availability of commercial high-resolution autocollimators capable of providing highly stable angle metrology down to aperture sizes of a few millimeters, even for uncoated optical surfaces. The measuring beam of the autocollimator not only provides the straight propagation of light as a natural straightness standard, but also tracing back the angle measurement to primary standards via calibration enables one to measure surface shape without any recourse to material straightness artifacts. The Physikalisch-Technische Bundesanstalt (PTB) provides the traceability of angle measurements by autocollimators to the radian (rad) - the SI unit of the plane angle - by use of its WMT 220 angle comparator. The fundamental principle of this comparator is the subdivision of the circle, representing an error-free natural standard of 2π rad. It is realized by various self- and cross-calibration methods. Autocollimators are calibrated by direct comparison with this primary standard with standard uncertainties down to 0.003 arcsec (15 nrad). As the aperture sizes of autocollimators decrease, issues such as the transferability / applicability of the calibration to the measurement conditions in the deflectometric set-up become more and more significant. In this paper we are focusing on the investigation of the influence of the distance between the autocollimator and the surface under test on its angle response. Information on the optimized use and accurate calibration of autocollimators for deflectometric applications is provided.

  3. Designing and Validating a Model for Measuring Sustainability of Overall Innovation Capability of Small and Medium-Sized Enterprises

    Directory of Open Access Journals (Sweden)

    Mohd Nizam Ab Rahman

    2015-01-01

    Full Text Available The business environment is currently characterized by intensified competition at both the national and firm levels. Many studies have shown that innovation positively affect firms in enhancing their competitiveness. Innovation is a dynamic process that requires a continuous, evolving, and mastered management. Evaluating the sustainability of overall innovation capability of a business is a major means of determining how well this firm effectively and efficiently manages its innovation process. A psychometrically valid scale of evaluating the sustainability of overall innovation capability of a firm is still insufficient in the current innovation literature. Thus, this study developed a reliable and valid scale of measuring the sustainability of overall innovation capability construct. The unidimensionality, reliability, and several validity components of the developed scale were tested using the data collected from 175 small and medium-sized enterprises in Iran. A series of systematic statistical analyses were performed. Results of the reliability measures, exploratory and confirmatory factor analyses, and several components of validity tests strongly supported an eight-dimensional (8D scale of measuring the sustainability of overall innovation capability construct. The dimensions of the scale were strategic management, supportive culture and structure, resource allocation, communication and networking, knowledge and technology management, idea management, project development, and commercialization capabilities.

  4. Dimensional measurement of micro-moulded parts by computed tomography

    DEFF Research Database (Denmark)

    Ontiveros, S.; Yagüe-Fabra, J.A.; Jiménez, R.

    2012-01-01

    Computed tomography (CT) is progressively assuming an important role in metrology applications and great efforts are being made in order to turn it into a reliable and standardized measuring technology. CT is typically used for non-destructive tests, but it is currently becoming very popular...... for dimensional metrology applications due to its strategic advantages such as the capability of performing measurements on both the component's surface and volume, allowing inspection possibilities to otherwise non-accessible internal features. This paper focuses on the dimensional verification of two micro......-injection moulded components, selected from actual industrial productions, using CT metrological tools. For this purpose, several parts have been measured with two different CT machines, and the results have been compared with the measurements obtained by other measuring systems. The experimental work carried out...

  5. Half a century of light scatter metrology and counting

    Science.gov (United States)

    Stover, John C.

    2014-09-01

    Back in the early days Bill Wolf once said something like: "The guy with the lowest scatter measurement is closest to the right answer." He was often right then - but not anymore. Everything has changed. Today measurements are limited by Rayleigh scatter from the air - not the instrument. We have both written and physical standards and everybody spells BRDF the same way. In the time it takes to give this talk, over 100,000 silicon wafers will be inspected around the world using a few thousand scatterometers - average price about one million dollars each. The way the world illuminates everything from homes to football fields is changing with the advent of high brightness LED's and these lighting systems are designed using a combination of scatter metrology and analysis techniques - many of which were started at The Optical Sciences Center. This paper reviews two major highlights in half a century of scatter metrology progress.

  6. Metrological management evaluation based on ISO10012: an empirical study in ISO-14001-certified Spanish companies

    Energy Technology Data Exchange (ETDEWEB)

    Beltran, Jaime; Rivas, Miguel [Andalusian Institute of Technology, C/Leonardo Da Vinci, 2, 41092 Sevilla (Spain); Munuzuri, Jesus [University of Seville, Av/Americo Vespucio, s/n. 41092 Sevilla (Spain); Gonzalez, Cristina [National University of Distance Education, C/Juan del Rosal, 2, 28040 Madrid (Spain)

    2010-01-15

    Environmental management systems based on the ISO 14001 standard rely strongly on metrological measurement and confirmation processes to certify the extent to which organizations monitor and improve their environmental behavior. Nevertheless, the literature lacks in studies that assess the influence of these metrological processes on the performance of environmental management in organizations, even now that the international standard ISO 10012 is already available to establish requisites and guidelines for the development of a metrological management system that is compatible with any other standardized management system. This work seeks to assess that influence through the development of an evaluation model for metrological management, which is then validated through an experimental analysis of the results obtained from the application of an audit process in 11 Spanish companies, all ISO-14001-certified and operating in different industrial sectors. (author)

  7. Electron counting capacitance standard and quantum metrology triangle experiments at PTB

    Science.gov (United States)

    Scherer, H.; Schurr, J.; Ahlers, F. J.

    2017-06-01

    This paper summarizes the final results of the electron counting capacitance standard experiment at the Physikalisch-Technische Bundesanstalt (PTB) achieved since the publication of a preliminary result in 2012. All systematic uncertainty contributions were experimentally quantified and are discussed. Frequency-dependent measurements on the 1 pF cryogenic capacitor were performed using a high-precision transformer-based capacitance bridge with a relative uncertainty of 0.03 µF F-1. The results revealed a crucial problem related to the capacitor, which hampered realizing the quantum metrology triangle with an accuracy corresponding to a combined total uncertainty of better than a few parts per million and eventually caused the discontinuation of the experiment at PTB. This paper provides a conclusion on the implications for future quantum metrology triangle experiments from the latest CODATA adjustment of fundamental constants, and summarizes perspectives and outlooks on future quantum metrology triangle experiments based on topical developments in small-current metrology.

  8. Advancing Cybersecurity Capability Measurement Using the CERT(registered trademark)-RMM Maturity Indicator Level Scale

    Science.gov (United States)

    2013-11-01

    Institute at permission@sei.cmu.edu. * These restrictions do not apply to U.S. government entities. CERT® and CMMI ® are registered marks of Carnegie...Attributes 4 1.3.4 Appraisal and Scoring Methods 5 1.3.5 Improvement Roadmaps 5 2 Introducing the Maturity Indicator Level (MIL) Concept 6 2.1...CERT®-RMM v1.2) utilizes the maturity architecture (levels and descriptions) as provided in the Capability Maturity Model Integration ( CMMI

  9. Cryogenic capability for equation-of-state measurements on the Sandia Z pulsed radiation source

    Energy Technology Data Exchange (ETDEWEB)

    Hanson, D.L.; Johnston, R.R.; Asay, J.R.

    1998-02-01

    Experimental cryogenic capabilities are essential for the study of ICF high-gain target and weapons effects issues involving dynamic materials response at low temperatures. The authors are developing a general purpose cryogenic target system for precision radiation driven EOS and shock physics experiments at liquid helium temperatures on the Sandia Z pulsed radiation source. Cryogenic sample cooling in the range of 6--30 K is provided by a liquid helium cryostat and an active temperature control system. The cryogenic target assembly is capable of condensing liquid deuterium samples from the gas phase at about 20 K, as well as cooling solid samples such as beryllium and CH ablators for ICF. The target assembly will also include the capability to use various shock diagnostics, such as VISAR interferometry and fiber-optic-coupled shock breakout diagnostics. They are characterizing the thermal and optical performance of the system components in an off-line cryogenic test facility and have designed an interface to introduce the cryogenic transfer lines, gas lines, and sensor cables into the Z vacuum section. Survivability of high-value cryogenic components in the destructive post-implosion environment of Z is a major issue driving the design of this cryogenic target system.

  10. Free Electron Laser For The Siberian Centre For Photochemical Reseach Software And Capabilities Of Beam Position Measurement System

    CERN Document Server

    Dementyev, E N; Medvedko, A S; Oreshkov, A D; Serednyakov, S I; Shubin, E N; Vinokurov, N A

    2004-01-01

    The system for electron beam position measurement in microtron-recuperator, using the electrostatic pick-up electrodes is described. Option of simultaneous detection of accelerated and decelerated electron beams is considered. The software and its capability of integration to the Epics control system using Epics Channel Access protocol are discussed.

  11. Roles of chemical metrology in electronics industry and associated environment in Korea: a tutorial.

    Science.gov (United States)

    Kang, Namgoo; Kim, Kyung Joong; Kim, Jin Seog; Lee, Joung Hae

    2015-03-01

    Chemical metrology is gaining importance in electronics industry that manufactures semiconductors, electronic displays, and microelectronics. Extensive and growing needs from this industry have raised the significance of accurate measurements of the amount of substances and material properties. For the first time, this paper presents information on how chemical metrology is being applied to meet a variety of needs in the aspects of quality control of electronics products and environmental regulations closely associated with electronics industry. For a better understanding of the roles of the chemical metrology within electronics industry, the recent research activities and results in chemical metrology are presented using typical examples in Korea where electronic industry is leading a national economy. Particular attention is paid to the applications of chemical metrology for advancing emerging electronics technology developments. Such examples are a novel technique for the accurate quantification of gas composition at nano-liter levels within a MEMS package, the surface chemical analysis of a semiconductor device. Typical metrological tools are also presented for the development of certified reference materials for fluorinated greenhouse gases and proficiency testing schemes for heavy metals and chlorinated toxic gas in order to cope properly with environmental issues within electronics industry. In addition, a recent technique is presented for the accurate measurement of the destruction and removal efficiency of a typical greenhouse gas scrubber.

  12. X-ray optics metrology limited by random noise, instrumental drifts, and systematic errors

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V.; Anderson, Erik H.; Barber, Samuel K.; Cambie, Rossana; Celestre, Richard; Conley, Raymond; Goldberg, Kenneth A.; McKinney, Wayne R.; Morrison, Gregory; Takacs, Peter Z.; Voronov, Dmitriy L.; Yuan, Sheng; Padmore, Howard A.

    2010-07-09

    Continuous, large-scale efforts to improve and develop third- and forth-generation synchrotron radiation light sources for unprecedented high-brightness, low emittance, and coherent x-ray beams demand diffracting and reflecting x-ray optics suitable for micro- and nano-focusing, brightness preservation, and super high resolution. One of the major impediments for development of x-ray optics with the required beamline performance comes from the inadequate present level of optical and at-wavelength metrology and insufficient integration of the metrology into the fabrication process and into beamlines. Based on our experience at the ALS Optical Metrology Laboratory, we review the experimental methods and techniques that allow us to mitigate significant optical metrology problems related to random, systematic, and drift errors with super-high-quality x-ray optics. Measurement errors below 0.2 mu rad have become routine. We present recent results from the ALS of temperature stabilized nano-focusing optics and dedicated at-wavelength metrology. The international effort to develop a next generation Optical Slope Measuring System (OSMS) to address these problems is also discussed. Finally, we analyze the remaining obstacles to further improvement of beamline x-ray optics and dedicated metrology, and highlight the ways we see to overcome the problems.

  13. The Metrology Study of Fragmentation Properties for Partition of Nonempty Measurable Set%非空可测集划分的破碎度量研究

    Institute of Scientific and Technical Information of China (English)

    郭嗣琮

    2011-01-01

    为解决材料科学中物体破碎度量的数学刻画问题,本文将物体的破碎抽象为具有有限测度的可测集合的一个划分,在分析了用碎块测度描述物体的破碎概念应满足的准则的条件下,依照破碎准则构建了一个能够刻画物体破碎程度的划分测度函数,得到了几何物体破碎程度的数学表达式.同时,研究了所提出的破碎度函数的一些性质,并讨论了几个方面的应用.破碎度的数学表述可以广泛地应用于矿物加工、岩石爆破、医药与食品加工等诸多领域.%This paper deals with the issue of the mathematical description of measuring the broken state of the object in material science. We look upon a broken object as a partition of measurable set with a finite measure, and develop a mathematical formulation, which is a partitioning measure function, to describe the broken state of geometric solids. The formulation is constructed based on the analysis of the principle which must be satisfied for expressing the concept of fragmentation in terms of fragment measure. We also derive some properties of partitioning measure function and discuss its applications. The mathematical description of the fragment measure can be widely used in the field of rock blasting, mineral processing, medicine production and food handing, etc.

  14. Adaptation Measurement of CAD/CAM Dental Crowns with X-Ray Micro-CT: Metrological Chain Standardization and 3D Gap Size Distribution

    Directory of Open Access Journals (Sweden)

    L. Tapie

    2016-01-01

    Full Text Available Computer-Aided Design and Manufacturing systems are increasingly used to produce dental prostheses, but the parts produced suffer from a lack of evaluation, especially concerning the internal gap of the final assembly, that is, the space between the prepared tooth and the prosthesis. X-ray micro-Computed Tomography (micro-CT is a noninvasive imaging technique enabling the internal inspection of the assembly. It has proved to be an efficient tool for measuring the gap. In this study, a critical review of the protocols using micro-CT to quantify the gap is proposed as an introduction to a new protocol aimed at minimizing errors and enabling comparison between CAD/CAM systems. To compare different systems, a standardized protocol is proposed including two reference geometries. Micro-CT is used to acquire the reference geometries. A new 3D method is then proposed and a new indicator is defined (Gap Size Distribution (GSD. In addition, the usual 2D measurements are described and discussed. The 3D gap measurement method proposed can be used in clinical case geometries and has the considerable advantage of minimizing the data processing steps before performing the measurements.

  15. Measuring the Usability and Capability of App Inventor to Create Mobile Applications

    OpenAIRE

    Xie, Benjamin X.; Shabir, Isra; Abelson, Hal

    2015-01-01

    MIT App Inventor is a web service that enables users with little to no previous programming experience to create mobile applications using a visual blocks language. We analyze a sample of 5,228 random projects from the corpus of 9.7 million and group projects by functionality. We then use the number of unique blocks in projects as a metric to better understand the usability and realized capability of using App Inventor to implement specific functionalities. We introduce the notion of a usabil...

  16. Metrology for industrial quantum communications: the MIQC project

    Science.gov (United States)

    Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

    2014-12-01

    The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

  17. Development of a virtual metrology method using plasma harmonics analysis

    Science.gov (United States)

    Jun, H.; Shin, J.; Kim, S.; Choi, H.

    2017-07-01

    A virtual metrology technique based on plasma harmonics is developed for predicting semiconductor processes. From a plasma process performed by 300 mm photoresist stripper equipment, a strong correlation is found between optical plasma harmonics intensities and the process results, such as the photoresist strip rate and strip non-uniformity. Based on this finding, a general process prediction model is developed. The developed virtual metrology model shows that the R-squared (R2) values between the measured and predicted process results are 95% and 64% for the photoresist strip rate and photoresist strip non-uniformity, respectively. This is the first research on process prediction based on optical plasma harmonics analysis, and the results can be applied to semiconductor processes such as dry etching and plasma enhanced chemical vapor deposition.

  18. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Sheng; Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Celestre, Rich; Church, Matthew; McKinney, Wayne R.; Morrison, Greg; Warwick, Tony

    2010-01-31

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situ visible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  19. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, S.; Yashchuk, V.V.; Goldberg, K.A.; Celestre, R.; Church, M.; McKinney, W.R.; Morrison, G.; Warwick, T.

    2009-09-18

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situvisible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  20. Mueller matrix imaging ellipsometry for nanostructure metrology.

    Science.gov (United States)

    Liu, Shiyuan; Du, Weichao; Chen, Xiuguo; Jiang, Hao; Zhang, Chuanwei

    2015-06-29

    In order to achieve effective process control, fast, inexpensive, nondestructive and reliable nanometer scale feature measurements are extremely useful in high-volume nanomanufacturing. Among the possible techniques, optical scatterometry is relatively ideal due to its high throughput, low cost, and minimal sample damage. However, this technique is inherently limited by the illumination spot size of the instrument and the low efficiency in construction of a map of the sample over a wide area. Aiming at these issues, we introduce conventional imaging techniques to optical scatterometry and combine them with Mueller matrix ellipsometry based scatterometry, which is expected to be a powerful tool for the measurement of nanostructures in future high-volume nanomanufacturing, and propose to apply Mueller matrix imaging ellipsometry (MMIE) for nanostructure metrology. Two kinds of nanostructures were measured using an in-house developed Mueller matrix imaging ellipsometer in this work. The experimental results demonstrate that we can achieve Mueller matrix measurement and analysis for nanostructures with pixel-sized illumination spots by using MMIE. We can also efficiently construct parameter maps of the nanostructures over a wide area with pixel-sized lateral resolution by performing parallel ellipsometric analysis for all the pixels of interest.

  1. Measuring Nutrition Governance: An Analysis of Commitment, Capability, and Collaboration in Nepal.

    Science.gov (United States)

    Webb, Patrick; Ghosh, Shibani; Shrestha, Robin; Namirembe, Grace; Gurung, Sabi; Sapkota, Diplav; Bell, Winnie Fay; Davis, Dale; Kennedy, Eileen; Neupane, Shailes; Manohar, Swetha; Baral, Kedar

    2016-12-01

    Global commitments to nutrition have supported calls for better evidence to support effective investments at national level. However, too little attention has so far been paid to the role of governance in achieving impacts. This article explores the ways by which the commitment and capabilities of policy implementers affect collaborative efforts for achieving nutrition goals. Over 1370 structured interviews were held with government and nongovernment officials over 3 years in 21 districts. Coded responses supported quantitative analysis of stakeholders' knowledge, attitudes, and practices regarding policy implementation. Stakeholder commitment was already high in 2013 when a new national policy was adopted, but capabilities were weak. Only one-third of interviewed respondents had any nutrition training. Rollout of training focusing on districts targeted for early implementation of multisector programming. This raised levels of nutrition training among interviewed respondents to 57% in 2015, which raised demand for technical information to support actions. Better understanding of the complexity of cross-sector work led to calls for higher budgets and more effective cross-sectoral collaboration. Nepal offers an example of effective efforts to improve nutrition governance across sectors at all levels of administration. The promotion of awareness, capacity, and new ways of working shows promise. Trainings, information sharing, and management support led to growing willingness among civil servants to engage across sectors. Structured surveys offer a viable way to track change across institutions and sectors. © The Author(s) 2016.

  2. A wide-range metrology AFM and its applications

    Science.gov (United States)

    Lin, Xiaofeng; Zhang, Haijun; Zhang, Dongxian

    2005-02-01

    In view of the fact that the application field of a dual tunneling-unit scanning tunneling microscope (DTU-STM) was strongly limited by sample conductivity, a dual imaging unit atomic force microscope (DIU-AFM) was developed for wide-range nano-metrology. A periodic grating is employed as a reference sample. The DIU-AFM simultaneously scans the grating and a test sample by using one single XY scanner. Their images thus have the same lateral size, and the length of the test sample image can be precisely measured by counting the number of periodic features of the reference grating. We further developed a new method of implementing wide-range nano-metrology. By alternatively moving the XY scanner in the X direction using a step motor, a series of pairs of images are obtained and can be spliced into two wide-range reference and test ones, respectively. Again, the two spliced images are of the same size, and the length of test image can be measured based on the reference grating features. In this way, wide-range metrology with nanometer order accuracy is successfully realized.

  3. An innovative bifocal metrology system for aerospace applications

    Science.gov (United States)

    Bresciani, F.

    2016-11-01

    In this paper an innovative space metrology system which objective is to measure the mutual arrangement between two spacecrafts is descripted. It is a simple and robust system that makes possible relative attitude measurements between 2 satellites in formation flying with coarse and fine accuracies. Generally, in formation flying mission it's necessary to have a satellite attitude control whose accuracy depends on their relative distance. The proposed metrology is based on an innovative optical projective system embedded on satellite 1 and a target composed by several light sources mounted on satellite 2. Optical system concurrently projects on a CCD two images of the target and from relative position of the light sources on the CCD image plane it's possible to detect position and attitude of the S2. Basic element of innovation of this versatile metrology concept is the possibility to work on a very large S/Cs range distance (~10 m-15 km) and to determinate the relative attitude and position of two spacecrafts on all six degree of freedom in a very simple and fast way.

  4. Transient terahertz photoconductivity measurements of minority-carrier lifetime in tin sulfide thin films: Advanced metrology for an early stage photovoltaic material

    Science.gov (United States)

    Jaramillo, R.; Sher, Meng-Ju; Ofori-Okai, Benjamin K.; Steinmann, V.; Yang, Chuanxi; Hartman, Katy; Nelson, Keith A.; Lindenberg, Aaron M.; Gordon, Roy G.; Buonassisi, T.

    2016-01-01

    Materials research with a focus on enhancing the minority-carrier lifetime of the light-absorbing semiconductor is key to advancing solar energy technology for both early stage and mature material platforms alike. Tin sulfide (SnS) is an absorber material with several clear advantages for manufacturing and deployment, but the record power conversion efficiency remains below 5%. We report measurements of bulk and interface minority-carrier recombination rates in SnS thin films using optical-pump, terahertz-probe transient photoconductivity (TPC) measurements. Post-growth thermal annealing in H2S gas increases the minority-carrier lifetime, and oxidation of the surface reduces the surface recombination velocity. However, the minority-carrier lifetime remains below 100 ps for all tested combinations of growth technique and post-growth processing. Significant improvement in SnS solar cell performance will hinge on finding and mitigating as-yet-unknown recombination-active defects. We describe in detail our methodology for TPC experiments, and we share our data analysis routines in the form freely available software.

  5. Sandia capabilities for the measurement, characterization, and analysis of heliostats for CSP.

    Energy Technology Data Exchange (ETDEWEB)

    Andraka, Charles E.; Christian, Joshua Mark; Ghanbari, Cheryl M.; Gill, David Dennis; Ho, Clifford Kuofei; Kolb, William J.; Moss, Timothy A.; Smith, Edward J.; Yellowhair, Julius

    2013-07-01

    The Concentrating Solar Technologies Organization at Sandia National Laboratories has a long history of performing important research, development, and testing that has enabled the Concentrating Solar Power Industry to deploy full-scale power plants. Sandia continues to pursue innovative CSP concepts with the goal of reducing the cost of CSP while improving efficiency and performance. In this pursuit, Sandia has developed many tools for the analysis of CSP performance. The following capabilities document highlights Sandias extensive experience in the design, construction, and utilization of large-scale testing facilities for CSP and the tools that Sandia has created for the full characterization of heliostats. Sandia has extensive experience in using these tools to evaluate the performance of novel heliostat designs.

  6. A Novel CMOS Device Capable of Measuring Near-Field Thermal Radiation

    Institute of Scientific and Technical Information of China (English)

    FENG Chong; TANG Zhen-An; YU Jun

    2012-01-01

    We report on the design,fabrication,and characterization of a micro plane-plane geometry CMOS device,which has a heat emitter and a heat receiver,capable of studying the near-field radiative heat transfer at a 550nm gap.Under high vacuum conditions,the heat emitter is heated by supplying driving currents and heated again after removing the heat receiver.The heating power difference between the two kinds of heating experiments indicates the existence of a proximity effect in the heat transfer between the emitter and the receiver.Our experiments pave the way towards overcoming the construction difficulty of plane-plane geometry with a nanometer gap.

  7. Relativistic quantum metrology in open system dynamics.

    Science.gov (United States)

    Tian, Zehua; Wang, Jieci; Fan, Heng; Jing, Jiliang

    2015-01-22

    Quantum metrology studies the ultimate limit of precision in estimating a physical quantity if quantum strategies are exploited. Here we investigate the evolution of a two-level atom as a detector which interacts with a massless scalar field using the master equation approach for open quantum system. We employ local quantum estimation theory to estimate the Unruh temperature when probed by a uniformly accelerated detector in the Minkowski vacuum. In particular, we evaluate the Fisher information (FI) for population measurement, maximize its value over all possible detector preparations and evolution times, and compare its behavior with that of the quantum Fisher information (QFI). We find that the optimal precision of estimation is achieved when the detector evolves for a long enough time. Furthermore, we find that in this case the FI for population measurement is independent of initial preparations of the detector and is exactly equal to the QFI, which means that population measurement is optimal. This result demonstrates that the achievement of the ultimate bound of precision imposed by quantum mechanics is possible. Finally, we note that the same configuration is also available to the maximum of the QFI itself.

  8. Advanced overlay analysis through design based metrology

    Science.gov (United States)

    Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro

    2015-03-01

    As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.

  9. Scientific language and metrology; El lenguaje cientificio y la metrologia

    Energy Technology Data Exchange (ETDEWEB)

    Campo Maldonado, D. del; Martin Blasco, B.; Prieto Esteban, E.

    2011-07-01

    The International System of Units (SI) reflects all the decisions and recommendations regarding units of measurement issued by the General Conference on Weights and Measures, including rules for writing the names and symbols of measurement units and for expressing the values of quantities. Even though the SI is internationally accepted and is the declared legal system whose use is obligatory in Spain, the Spanish Metrology Centre has been detecting an incorrect use of the units of measurement both in textbooks at all levels and in scientific articles. (Author) 5 refs.

  10. Total selenium and selenomethionine in pharmaceutical yeast tablets: assessment of the state of the art of measurement capabilities through international intercomparison CCQM-P86.

    Science.gov (United States)

    Goenaga-Infante, H; Sturgeon, R; Turner, J; Hearn, R; Sargent, M; Maxwell, P; Yang, L; Barzev, A; Pedrero, Z; Cámara, C; Díaz Huerta, V; Fernández Sánchez, M L; Sanz-Medel, A; Emese, K; Fodor, P; Wolf, W; Goldschmidt, R; Vacchina, V; Szpunar, J; Valiente, L; Huertas, R; Labarraque, G; Davis, C; Zeisler, R; Turk, G; Rizzio, E; Mackay, L G; Myors, R B; Saxby, D L; Askew, S; Chao, W; Jun, W

    2008-01-01

    Results of an international intercomparison study (CCQM-P86) to assess the analytical capabilities of national metrology institutes (NMIs) and selected expert laboratories worldwide to accurately quantitate the mass fraction of selenomethionine (SeMet) and total Se in pharmaceutical tablets of selenised-yeast supplements (produced by Pharma Nord, Denmark) are presented. The study, jointly coordinated by LGC Ltd., UK, and the Institute for National Measurement Standards, National Research Council of Canada (NRCC), was conducted under the auspices of the Comité Consultatif pour la Quantité de Matière (CCQM) Inorganic Analysis Working Group and involved 15 laboratories (from 12 countries), of which ten were NMIs. Apart from a protocol for determination of moisture content and the provision of the certified reference material (CRM) SELM-1 to be used as the quality control sample, no sample preparation/extraction method was prescribed. A variety of approaches was thus used, including single-step and multiple-step enzymatic hydrolysis, enzymatic probe sonication and hydrolysis with methanesulfonic acid for SeMet, as well as microwave-assisted acid digestion and enzymatic probe sonication for total Se. For total Se, detection techniques included inductively coupled plasma (ICP) mass spectrometry (MS) with external calibration, standard additions or isotope dilution MS (IDMS), inductively coupled plasma optical emission spectrometry , flame atomic absorption spectrometry and instrumental neutron activation analysis. For determination of SeMet in the tablets, five NMIs and three academic/institute laboratories (of a total of five) relied upon measurements using IDMS. For species-specific IDMS measurements, an isotopically enriched standard of SeMet (76Se-enriched SeMet) was made available. A novel aspect of this study relies on the approach used to distinguish any errors which arise during analysis of a SeMet calibration solution from those which occur during analysis of

  11. Response distortion in personality measurement: born to deceive, yet capable of providing valid self-assessments?

    Directory of Open Access Journals (Sweden)

    STEPHAN DILCHERT

    2006-09-01

    Full Text Available This introductory article to the special issue of Psychology Science devoted to the subject of “Considering Response Distortion in Personality Measurement for Industrial, Work and Organizational Psychology Research and Practice” presents an overview of the issues of response distortion in personality measurement. It also provides a summary of the other articles published as part of this special issue addressing social desirability, impression management, self-presentation, response distortion, and faking in personality measurement in industrial, work, and organizational settings.

  12. Welcome to Surface Topography: Metrology and Properties

    Science.gov (United States)

    Leach, Richard

    2013-11-01

    I am delighted to welcome readers to this inaugural issue of Surface Topography: Metrology and Properties (STMP). In these days of citation indexes and academic reviews, it is a tough, and maybe a brave, job to start a new journal. But the subject area has never been more active and we are seeing genuine breakthroughs in the use of surfaces to control functional performance. Most manufactured parts rely on some form of control of their surface characteristics. The surface is usually defined as that feature on a component or device, which interacts with either the environment in which it is housed (or in which the device operates), or with another surface. The surface topography and material characteristics of a part can affect how fluids interact with it, how the part looks and feels and how two bearing parts will slide together. The need to control, and hence measure, surface features is becoming increasingly important as we move into a miniaturized world. Surface features can become the dominant functional features of a part and may become large in comparison to the overall size of an object. Research into surface texture measurement and characterization has been carried out for over a century and is now more active than ever, especially as new areal surface texture specification standards begin to be introduced. The range of disciplines for which the function of a surface relates to its topography is very diverse; from metal sheet manufacturing to art restoration, from plastic electronics to forensics. Until now, there has been no obvious publishing venue to bring together all these applications with the underlying research and theory, or to unite those working in academia with engineering and industry. Hence the creation of Surface Topography: Metrology and Properties . STMP will publish the best work being done across this broad discipline in one journal, helping researchers to share common themes and highlighting and promoting the extraordinary benefits this

  13. Metrology, applications and methods with high energy CT systems

    Energy Technology Data Exchange (ETDEWEB)

    Uhlmann, N.; Voland, V.; Salamon, M.; Hebele, S.; Boehnel, M.; Reims, N.; Schmitt, M.; Kasperl, S. [Fraunhofer IIS/EZRT, Development Center X-Ray Technology, Flugplatzstrasse 75, 90768 Fürth (Germany); Hanke, R. [Chair of X-ray Microscopy, University of Würzburg - Physics and Astronomy (Germany)

    2014-02-18

    The increase of Computed Tomography (CT) as an applicable metrology and Non Destructive Testing (NDT) method raises interest on developing the application fields to larger objects, which were rarely used in the past due to their requirements on the imaging system. Especially the classical X-ray generation techniques based on standard equipment restricted the applications of CT to typical material penetration lengths of only a few cm of steel. Even with accelerator technology that offers a suitable way to overcome these restrictions just the 2D radioscopy technique found a widespread application. Beside the production and detection of photons in the MeV range itself, the achievable image quality is limited using standard detectors due to the dominating absorption effect of Compton Scattering at high energies. Especially for CT reconstruction purposes these effects have to be considered on the development path from 2D to 3D imaging. Most High Energy CT applications are therefore based on line detectors shielding scattered radiation to a maximum with an increase in imaging quality but with time consuming large volume scan capabilities. In this contribution we present the High-Energy X-ray Imaging project at the Fraunhofer Development Centre for X-ray Technology with the characterization and the potential of the CT-system according to metrological and other application capabilities.

  14. The PAMELA experiment on satellite and its capability in cosmic rays measurements

    CERN Document Server

    Adriani, O; Barbarino, G C; Barbier, L M; Bartalucci, S; Bazilevskaja, G; Bellotti, R; Bertazzoni, S; Bidoli, V; Boezio, M; Bogomolov, E A; Bonechi, L; Bonvicini, V; Boscherini, M; Bravar, U; Cafagna, F; Campana, D; Carlson, Per J; Casolino, M; Castellano, M; Castellini, G; Christian, E R; Ciacio, F; Circella, M; D'Alessandro, R; De Marzo, C N; De Pascale, M P; Finetti, N; Furano, G; Gabbanini, A; Galper, A M; Giglietto, N; Grandi, M; Grigorieva, A; Guarino, F; Hof, M; Koldashov, S V; Korotkov, M G; Krizmanic, J F; Krutkov, S; Lund, J; Marangelli, B; Marino, L; Menn, W; Mikhailov, V V; Mirizzi, N; Mitchell, J W; Mocchiutti, E; Moiseev, A A; Morselli, A; Mukhametshin, R; Ormes, J F; Osteria, G; Ozerov, J V; Papini, P; Pearce, M; Perego, A; Piccardi, S; Picozza, P; Ricci, M; Salsano, A; Schiavon, Paolo; Scian, G; Simon, M; Sparvoli, R; Spataro, B; Spillantini, P; Spinelli, P; Stephens, S A; Stochaj, S J; Stozhkov, Yu I; Straulino, S; Streitmatter, R E; Taccetti, F; Tesi, M; Vacchi, A; Vannuccini, E; Vasiljev, G; Vignoli, V; Voronov, S A; Yurkin, Y; Zampa, G; Zampa, N

    2002-01-01

    The PAMELA equipment will be assembled in 2001 and installed on board the Russian satellite Resurs. PAMELA is conceived mainly to study the antiproton and positron fluxes in cosmic rays up to high energy (190 GeV for p-bar and 270 GeV for e sup +) and to search antinuclei, up to 30 GeV/n, with a sensitivity of 10 sup - sup 7 in the He-bar/He ratio. The PAMELA telescope consists of: a magnetic spectrometer made up of a permanent magnet system equipped with double sided microstrip silicon detectors; a transition radiation detector made up of active layers of proportional straw tubes interleaved with carbon fibre radiators; and a silicon-tungsten imaging calorimeter made up of layers of tungsten absorbers and silicon detector planes. A time-of-flight system and anti-coincidence counters complete the PAMELA equipment. In the past years, tests have been done on each subdetector of PAMELA; the main results are presented and their implications on the anti-particles identification capability in cosmic rays are discus...

  15. The PAMELA experiment on satellite and its capability in cosmic rays measurements

    Energy Technology Data Exchange (ETDEWEB)

    Adriani, O.; Ambriola, M.; Barbarino, G.; Barbier, L.M.; Bartalucci, S.; Bazilevskaja, G.; Bellotti, R.; Bertazzoni, S.; Bidoli, V.; Boezio, M.; Bogomolov, E.; Bonechi, L.; Bonvicini, V.; Boscherini, M.; Bravar, U.; Cafagna, F.; Campana, D.; Carlson, P.; Casolino, M.; Castellano, M.; Castellini, G.; Christian, E.R.; Ciacio, F.; Circella, M.; D' Alessandro, R.; De Marzo, C.N.; De Pascale, M.P.; Finetti, N.; Furano, G.; Gabbanini, A.; Galper, A.M.; Giglietto, N.; Grandi, M.; Grigorjeva, A.; Guarino, F.; Hof, M.; Koldashov, S.V.; Korotkov, M.G.; Krizmanic, J.F.; Krutkov, S.; Lund, J.; Marangelli, B.; Marino, L.; Menn, W.; Mikhailov, V.V.; Mirizzi, N.; Mitchell, J.W.; Mocchiutti, E.; Moiseev, A.A.; Morselli, A.; Mukhametshin, R.; Ormes, J.F.; Osteria, G.; Ozerov, J.V.; Papini, P.; Pearce, M.; Perego, A.; Piccardi, S.; Picozza, P.; Ricci, M.; Salsano, A.; Schiavon, P.; Scian, G.; Simon, M.; Sparvoli, R.; Spataro, B.; Spillantini, P.; Spinelli, P.; Stephens, S.A.; Stochaj, S.J.; Stozhkov, Y.; Straulino, S. E-mail: straulino@fi.infi.it; Streitmatter, R.E.; Taccetti, F.; Tesi, M.; Vacchi, A.; Vannuccini, E.; Vasiljev, G.; Vignoli, V.; Voronov, S.A.; Yurkin, Y.; Zampa, G.; Zampa, N

    2002-02-01

    The PAMELA equipment will be assembled in 2001 and installed on board the Russian satellite Resurs. PAMELA is conceived mainly to study the antiproton and positron fluxes in cosmic rays up to high energy (190 GeV for p-bar and 270 GeV for e{sup +}) and to search antinuclei, up to 30 GeV/n, with a sensitivity of 10{sup -7} in the He-bar/He ratio. The PAMELA telescope consists of: a magnetic spectrometer made up of a permanent magnet system equipped with double sided microstrip silicon detectors; a transition radiation detector made up of active layers of proportional straw tubes interleaved with carbon fibre radiators; and a silicon-tungsten imaging calorimeter made up of layers of tungsten absorbers and silicon detector planes. A time-of-flight system and anti-coincidence counters complete the PAMELA equipment. In the past years, tests have been done on each subdetector of PAMELA; the main results are presented and their implications on the anti-particles identification capability in cosmic rays are discussed here.

  16. Instrumentation for Performance, Blade Loads and Flowfield Measurement of Novel Hover-Capable Meso-Scale Aerial Platforms

    Science.gov (United States)

    2016-12-07

    the blade airloads/surface pressure distribution in the rotating frame and the unsteady flowfield. The test rigs will be designed to have the...SECURITY CLASSIFICATION OF: The objective of this instrumentation proposal is to develop a state-of-the-art micro- air -vehicle (MAV) test facility at...Texas A&M University. This will be capable of measuring not only the fixed-frame hub loads, but also the blade airloads/surface pressure distribution

  17. Understanding CMMI Measurement Capabilities & Impact on Performance: Results from the 2007 SEI State of the Measurement Practice Survey

    Science.gov (United States)

    2016-06-30

    Practice Survey New this year • Screening question to identify respondents whose organizations develop software but rarely if ever do measurement...Questions about — Resources & infrastructure devoted to measurement — Practices to ensure data quality & integrity — Value added by doing measurement — The...University Project & Organizational Measurement Results Reported2 Business Growth & Profitability ML1&DK ML2 ML3 ML4&5 N = 70 N = 55 N = 45 N = 51

  18. Nuclear Technology. Course 26: Metrology. Module 27-7, Statistical Techniques in Metrology.

    Science.gov (United States)

    Espy, John; Selleck, Ben

    This seventh in a series of eight modules for a course titled Metrology focuses on descriptive and inferential statistical techniques in metrology. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6) materials…

  19. Nuclear Technology. Course 27: Metrology. Module 27-1, Fundamentals of Metrology.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This first in a series of eight modules for a course titled Metrology describes the fundamentals of metrology as they pertain to dimensional inspection. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6)…

  20. Measurements of the water-following capability of holey-sock and TRISTAR drifters

    Science.gov (United States)

    Niiler, Pearn P.; Sybrandy, Andrew S.; Bi, Kenong; Poulain, Pierre M.; Bitterman, David

    1995-11-01

    Since 1985, a number of measurements have been made in deep water to determine the water-following characteristics of mixed layer drifters with both holey-sock and TRISTAR drogues at 15 m depth. The measurements were done by attaching two neutrally buoyant vector measuring current meters (VMCMs) to the top and the bottom of the drogues and deploying the drifters in different wind and upper ocean shear conditions for periods of 2-4 h. The average velocity of the VMCM records was taken to be a quantitative measure of the slip of the drogue through the water, observed to be 0.5-3.5 cm s -1. The most important hydrodynamic design parameter which influenced the slip of the drogue was the ratio of the drag area of the drogue to the sum of the drag areas of the tether and surface floats: the drag area ratio R. The most important environmental parameters which affected the slip were the wind and the measured velocity difference across the vertical extent of the drogue. A model of the vector slip as a function of R, vector wind and velocity difference across the drogue was developed and a least squares fit accounts for 85% of the variance of the slip measurements. These measurements indicated that to reduce the wind produced slip below 1 cm s -1 in 10 m s -1 wind speed, R > 40. Conversely, if the daily average wind is known to 5 m s -1 accuracy, the displacement of the R = 40 drifter can be corrected to an accuracy of 0.5 km day -1.

  1. Nanomanufacturing metrology for cellulosic nanomaterials: an update

    Science.gov (United States)

    Postek, Michael T.

    2014-08-01

    The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, wood-based nanotechnology) is imperative to the success of this rising economic sector. Wood-based nanotechnology is a revolutionary technology that will create new jobs and strengthen America's forest-based economy through industrial development and expansion. It allows this, previously perceived, low-tech industry to leap-frog directly into high-tech products and processes and thus improves its current economic slump. Recent global investments in nanotechnology programs have led to a deeper appreciation of the high performance nature of cellulose nanomaterials. Cellulose, manufactured to the smallest possible-size ( 2 nm x 100 nm), is a high-value material that enables products to be lighter and stronger; have less embodied energy; utilize no catalysts in the manufacturing, are biologically compatible and, come from a readily renewable resource. In addition to the potential for a dramatic impact on the national economy - estimated to be as much as $250 billion worldwide by 2020 - cellulose-based nanotechnology creates a pathway for expanded and new markets utilizing these renewable materials. The installed capacity associated with the US pulp and paper industry represents an opportunity, with investment, to rapidly move to large scale production of nano-based materials. However, effective imaging, characterization and fundamental measurement science for process control and characterization are lacking at the present time. This talk will discuss some of these needed measurements and potential solutions.

  2. Developments in remote metrology at JET

    Energy Technology Data Exchange (ETDEWEB)

    Mindham, T.J., E-mail: tim.mindham@ccfe.ac.uk [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Sandford, G.C.; Hermon, G. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Belcher, C. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Oxford Technologies Ltd., 7 Nuffield Way, Abingdon, OX14 1RJ (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Pace, N. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Babcock Nuclear Division, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom)

    2011-10-15

    The need to maximise the operational availability of fusion devices has driven the enhancements in accuracy, flexibility and speed associated with the inspection techniques used at JET. To this end, the remote installation of the ITER-Like Wall (ILW) tiles, conduits and embedded diagnostics has necessitated the adoption of technologies from other industries for their use in conjunction with the JET Remote Handling (RH) system. The novel adaptation of targetless stereophotogrammetry, targeted single-camera photogrammetry and gap measurement techniques for remote applications has prompted a range of challenges and lessons learnt both from the design process and operational experience. Interfacing Commercial Off-The-Shelf (COTS) components with the existing RH equipment has highlighted several issues of relevance to the developing ITER RH system. This paper reports results from the stereophotogrammetry and the single-camera photogrammetry surveys, allowing analysis of the effectiveness of the RH system as a platform for in-vessel measurement. This includes scrutiny of the accuracy achieved with each technique as well as the impact on the in-vessel Configuration Management Model (CMM). The paper concludes with a summary of key recommendations for the ITER RH system based on the experience of remote metrology at JET.

  3. OPC aware mask and wafer metrology

    Science.gov (United States)

    Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik M.; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt G.; England, Jonathan G.; Howard, William B.

    2002-08-01

    Lithography at its limit of resolution is a highly non- linear pattern transfer process. Typically the shapes of printed features deviate considerably from their corresponding features in the layout. This deviation is known as Optical Proximity Effect, and its correction Optical Proximity effect Correction or OPC. Although many other so-called optical enhancement technologies are applied to cope with the issues of lithography at its limit of resolution, almost none of these can re-store the linearity of the pattern transfer. Hence fully functional OPC has become a very basic requirement for current and future lithography processes. In general, proximity effects are two-dimensional (2d) effects. Thus any measurement of proximity effects or any characterization of the effectiveness of OPC has to be two- dimensional. As OPC modifies shapes in the data for mask writing in a way to compensate for the expected proximity effects of the following processing steps, parameters describing the particular OPC-mask quality is a major concern. One-dimensional mask specifications, such as linewidth mean-to-target and uniformity, pattern placement, and maximum size of a tolerable defect, are not sufficient anymore to completely describe the functionality of a given mask for OPC. Two-dimensional mask specifications need to be evaluated. We present in this paper a basic concept for 2d metrology. Examples for 2d measurements to assess the effectiveness of OPC are given by the application of an SEM Image Analysis tool to an advanced 130nm process.

  4. Evaluating the capabilities and uncertainties of droplet measurements for the fog droplet spectrometer (FM-100

    Directory of Open Access Journals (Sweden)

    J. K. Spiegel

    2012-05-01

    Full Text Available Droplet size spectra measurements are crucial to obtain a quantitative microphysical description of clouds and fog. However, cloud droplet size measurements are subject to various uncertainties. This work focuses on the evaluation of two key measurement uncertainties arising during cloud droplet size measurements with a conventional droplet size spectrometer (FM-100: first, we addressed the precision with which droplets can be sized with the FM-100 on the basis of Mie theory. We deduced error assumptions and proposed how to correct measured size distributions for these errors by redistributing the measured droplet size distribution using a stochastic approach. Second, based on a literature study, we derived corrections for particle losses during sampling with the FM-100. We applied both corrections to cloud droplet size spectra measured at the high alpine site Jungfraujoch for a temperature range from 0 °C to 11 °C. We show that Mie scattering led to spikes in the droplet size distributions using the default sizing procedure, while the stochastic approach reproduced the ambient size distribution adequately. A detailed analysis of the FM-100 sampling efficiency revealed that particle losses were typically below 10% for droplet diameters up to 10 μm. For larger droplets, particle losses can increase up to 90% for the largest droplets of 50 μm at ambient windspeeds below 4.4 m s−1 and even to >90% for larger angles between the instrument orientation and the wind vector (sampling angle at higher wind speeds. Comparisons of the FM-100 to other reference instruments revealed that the total liquid water content (LWC measured by the FM-100 was more sensitive to particle losses than to re-sizing based on Mie scattering, while the total number concentration was only marginally influenced by particle losses. As a consequence, for further LWC measurements with the FM-100 we strongly recommend to consider (1 the error arising due to Mie

  5. Evaluating the capabilities and uncertainties of droplet measurements for the fog droplet spectrometer (FM-100

    Directory of Open Access Journals (Sweden)

    J. K. Spiegel

    2012-09-01

    Full Text Available Droplet size spectra measurements are crucial to obtain a quantitative microphysical description of clouds and fog. However, cloud droplet size measurements are subject to various uncertainties. This work focuses on the error analysis of two key measurement uncertainties arising during cloud droplet size measurements with a conventional droplet size spectrometer (FM-100: first, we addressed the precision with which droplets can be sized with the FM-100 on the basis of the Mie theory. We deduced error assumptions and proposed a new method on how to correct measured size distributions for these errors by redistributing the measured droplet size distribution using a stochastic approach. Second, based on a literature study, we summarized corrections for particle losses during sampling with the FM-100. We applied both corrections to cloud droplet size spectra measured at the high alpine site Jungfraujoch for a temperature range from 0 °C to 11 °C. We showed that Mie scattering led to spikes in the droplet size distributions using the default sizing procedure, while the new stochastic approach reproduced the ambient size distribution adequately. A detailed analysis of the FM-100 sampling efficiency revealed that particle losses were typically below 10% for droplet diameters up to 10 μm. For larger droplets, particle losses can increase up to 90% for the largest droplets of 50 μm at ambient wind speeds below 4.4 m s−1 and even to >90% for larger angles between the instrument orientation and the wind vector (sampling angle at higher wind speeds. Comparisons of the FM-100 to other reference instruments revealed that the total liquid water content (LWC measured by the FM-100 was more sensitive to particle losses than to re-sizing based on Mie scattering, while the total number concentration was only marginally influenced by particle losses. Consequently, for further LWC measurements with the FM-100 we strongly recommend to consider (1 the

  6. Capability of multi-viewing-angle photo-polarimetric measurements for the simultaneous retrieval of aerosol and cloud properties

    Directory of Open Access Journals (Sweden)

    O. P. Hasekamp

    2010-03-01

    Full Text Available An important new challenge in the field of multi-angle photopolarimetric satellite remote sensing is the retrieval of aerosol properties under cloudy conditions. In this paper the possibility has been explored to perform a simultaneous retrieval of aerosol and cloud properties for partly cloudy scenes and for fully cloudy scenes where the aerosol layer is located above the cloud, using multi-angle photo-polarimetric measurements. Also, for clear sky conditions a review is given of the capabilities of multi-angle photo-polarimetric measurements in comparison with other measurement types. It is shown that already for clear sky conditions polarization measurements are highly important for the retrieval of aerosol optical and microphysical properties over land surfaces with unknown reflection properties. Furthermore, it is shown that multi-angle photo-polarimetric measurements have the capability to distinguish between aerosols and clouds, and thus facilitate a simultaneous retrieval of aerosol and cloud properties. High accuracy (0.002–0.004 of the polarimetric measurements plays an essential role here.

  7. Capability of multi-viewing-angle photo-polarimetric measurements for the simultaneous retrieval of aerosol and cloud properties

    Directory of Open Access Journals (Sweden)

    O. P. Hasekamp

    2010-07-01

    Full Text Available An important new challenge in the field of multi-angle photo-polarimetric satellite remote sensing is the retrieval of aerosol properties under cloudy conditions. In this paper the possibility has been explored to perform a simultaneous retrieval of aerosol and cloud properties for partly cloudy scenes and for fully cloudy scenes where the aerosol layer is located above the cloud, using multi-angle photo-polarimetric measurements. Also, for clear sky conditions a review is given of the capabilities of multi-angle photo-polarimetric measurements in comparison with other measurement types. It is shown that already for clear sky conditions polarization measurements are highly important for the retrieval of aerosol optical and microphysical properties over land surfaces with unknown reflection properties. Furthermore, it is shown that multi-angle photo-polarimetric measurements have the capability to distinguish between aerosols and clouds, and thus facilitate a simultaneous retrieval of aerosol and cloud properties. High accuracy (0.002–0.004 of the polarimetric measurements plays an essential role here.

  8. DNA Studies Using Atomic Force Microscopy: Capabilities for Measurement of Short DNA Fragments

    Directory of Open Access Journals (Sweden)

    Dalong ePang

    2015-01-01

    Full Text Available Short DNA fragments, resulting from ionizing radiation induced DNA double strand breaks (DSBs, or released from cells as a result of physiological processes and circulating in the blood stream, may play important roles in cellular function and potentially in disease diagnosis and early intervention. The size distribution of DNA fragments contribute to knowledge of underlining biological processes. Traditional techniques used in radiation biology for DNA fragment size measurements lack the resolution to quantify short DNA fragments. For the measurement of cell-free circulating DNA (ccfDNA, real time quantitative Polymerase Chain Reaction (q-PCR provides quantification of DNA fragment sizes, concentration and specific gene mutation. A complementary approach, the imaging-based technique using Atomic Force Microscopy (AFM provides direct visualization and measurement of individual DNA fragments. In this review, we summarize and discuss the application of AFM-based measurements of DNA fragment sizes. Imaging of broken plasmid DNA, as a result of exposure to ionizing radiation, as well as ccfDNA in clinical specimens offer an innovative approach for studies of short DNA fragments and their biological functions.

  9. Advancements in Root Growth Measurement Technologies and Observation Capabilities for Container-Grown Plants

    Directory of Open Access Journals (Sweden)

    Lesley A. Judd

    2015-07-01

    Full Text Available The study, characterization, observation, and quantification of plant root growth and root systems (Rhizometrics has been and remains an important area of research in all disciplines of plant science. In the horticultural industry, a large portion of the crops grown annually are grown in pot culture. Root growth is a critical component in overall plant performance during production in containers, and therefore it is important to understand the factors that influence and/or possible enhance it. Quantifying root growth has varied over the last several decades with each method of quantification changing in its reliability of measurement and variation among the results. Methods such as root drawings, pin boards, rhizotrons, and minirhizotrons initiated the aptitude to measure roots with field crops, and have been expanded to container-grown plants. However, many of the published research methods are monotonous and time-consuming. More recently, computer programs have increased in use as technology advances and measuring characteristics of root growth becomes easier. These programs are instrumental in analyzing various root growth characteristics, from root diameter and length of individual roots to branching angle and topological depth of the root architecture. This review delves into the expanding technologies involved with expertly measuring root growth of plants in containers, and the advantages and disadvantages that remain.

  10. Recent developments in radon metrology: new aspects in the calibration of radon, thoron and progeny devices.

    Science.gov (United States)

    Röttger, A; Honig, A

    2011-05-01

    Due to the importance of reliable measurements of radon activity concentration, one of the past developments in metrology was applied to the field of radon, thus meeting two basic needs: (1) the harmonisation of metrology within the scope of the mutual recognition arrangement, an arrangement drawn up by the International Committee of Weights and Measures for the mutual recognition of national standards and of calibrations issued by national metrology institutes and (2) the increased demands of the European Atomic Energy Community (EURATOM) directive, transferred into national radiation protection regulations with regard to natural radioactivity and its quality-assured measurements. This paper gives an overview of typical technical procedures in the radon-measuring technique group of PTB, covering all aspects of reference atmospheres (primary standards) for radon, thoron and their respective progenies.

  11. Drift chamber electronics with multi-hit capability for time and current division measurements

    Energy Technology Data Exchange (ETDEWEB)

    Manarin, A.; Pregernig, L.; Rabany, M.; Saban, R.; Vismara, G.

    1983-11-15

    Drift chambers have been installed for luminosity measurements in intersection 5 of the SPS accelerator working in panti p colliding mode. The required electronics is described. The system is able to process up to 16 hits per wire with a double pulse resolution of 40 ns; drift time and current division, with 1.25 ns and 1.6% resolution respectively, are recorded. Transconductance preamplifiers and discriminators are directly mounted on the chamber; 160 m of twisted-apir cable bring the signals to the digitizer unit. Coarse time is measured using RAM techniques, while fine time is obtained by means of a microstrip delay associated with a 100 K ECL priority encoder. Current division used a single 50 MHz Flash ADC which alows 26 dB dynamic range with 6 bit resolution. First operational results are reported.

  12. Data acquisition system time measurement capabilities using WorkBench[trademark] software

    Energy Technology Data Exchange (ETDEWEB)

    Coutts, D.A.

    1992-04-01

    There is an increasing interest in the ability to measure transient behavior in the Heat Transfer Laboratory (HTL). To accomplish this the timing system behavior for the Data Acquisition Systems (DAS) must be evaluated. This report discusses the evaluation of a DAS timing system using WorkBench[trademark] Software in a Macintosh II environment. It also describes a method which can be successfully used to calibrate the timing system associated with the DAS.

  13. Data acquisition system time measurement capabilities using WorkBench{trademark} software

    Energy Technology Data Exchange (ETDEWEB)

    Coutts, D.A.

    1992-04-01

    There is an increasing interest in the ability to measure transient behavior in the Heat Transfer Laboratory (HTL). To accomplish this the timing system behavior for the Data Acquisition Systems (DAS) must be evaluated. This report discusses the evaluation of a DAS timing system using WorkBench{trademark} Software in a Macintosh II environment. It also describes a method which can be successfully used to calibrate the timing system associated with the DAS.

  14. A New Satellite Measurement Capability for Assessing Damage to Crops from Regional Scale Ozone Pollution

    Science.gov (United States)

    Fishman, J. J.; Creilson, J. K.; Parker, P. A.; Ainsworth, E. A.; Vining, G. G.; Szarka, J. L.

    2009-05-01

    High concentrations of ground-level ozone are frequently measured over farmland regions in many parts of the world. Since laboratory data show that ozone can significantly impact crop productivity if levels above a threshold concentration are reached, there is a consensus that crop yield should be impacted now and that the effects will become even more detrimental as global background concentrations continue to rise, as suggested by the latest IPCC report. Using the long-term record of tropospheric ozone derived from satellite measurements (http://asd-www.larc.nasa.gov/TOR/data.html), we present a methodology that can be used to assess the impact of regional ozone pollution on crop productivity. In this study, we use soybean crop yield data during a 5-year period over the Midwest of the United States and analyze the results using multiple linear regression statistical models. The results are consistent with findings using conventional ground-based measurements and with results obtained from an open-air experimental facility SoyFACE (Soybean Free Air Concentration Enrichment) in central Illinois. Our analysis suggests that the cost to the farmers globally is substantial, and supports other studies that calculate an economic loss to the farming community of more than 10 billion dollars annually.

  15. Recent Developments in Nuclear Data Measurement capabilities at the Gaerttner LINAC Center at RPI

    Directory of Open Access Journals (Sweden)

    Danon Y.

    2016-01-01

    Full Text Available The Gaerttner LINAC Center at RPI uses a 60 MeV electron linear accelerator to produce short pulses of neutrons with duration of 5-5000 ns. The main research thrust at the Center is nuclear data for nuclear reactors and criticality safety applications. The Center includes several setups for time-of-flight measurements including neutron transmission, capture and scattering detectors, and a lead slowing-down spectrometer. Experiments were designed to produce neutron interaction cross sections that cover the energy range of 0.01 eV to 20 MeV. Recently added experiments include: setups for keV and fast neutron transmission, a C6D6 detector array for keV neutron capture measurements, and a fast neutron scattering system. Results discussed here include fast neutron scattering and angular distributions for natFe, iron capture measurements for incident neutrons from 1 keV to 2 MeV, fast neutron transmission through W and H2O samples, and keV transmission through Mo isotopes.

  16. "Negative Capability" in Shakespeare's Measure for Measure%莎士比亚《一报还一报》中的"消极感受力"

    Institute of Scientific and Technical Information of China (English)

    肖飚; 黄雯琴

    2007-01-01

    围绕被英国浪漫主义诗人约翰·济慈极力推崇的创作禀赋--"消极感受力",采用新批评"文本细读法",仔细研读莎士比亚戏剧《一报还一报》.并通过分析该剧在戏剧类型、人物塑造以及结尾等方面所呈现出的歧义性,指出该剧充分体现了莎士比亚的"消极感受力".%The paper addresses the topic of "Negative Capability" and its embodiment of Shakespeare in his Measure for Measure.According to John Keats,Negative Capability is that "when man is capable of being in uncertainties,mysteries,doubts,without any irritable reaching after fact and reason." The present paper delves into Measure for Measure with a focus on its genre,characterization and ending and reaches the conclusion that Negative Capability is brought into full swing in the play.

  17. The development of a CPX measurement set-up capable of measuring tire-road noise effectively

    NARCIS (Netherlands)

    Bekke, D.A.

    2009-01-01

    In the Directive 2001/43 limits are put on the maximum noise level of a pass-by noise measurement on an ISO 10844 surface. This prescribed measurement set-up only gives an LAmax level of the total passage of a whole vehicle equipped with four tires and does not provide enough information for a probl

  18. Measurement of the Robot Motor Capability of a Robot Motor System: A Fitts’s-Law-Inspired Approach

    Directory of Open Access Journals (Sweden)

    C. S. George Lee

    2013-07-01

    Full Text Available Robot motor capability is a crucial factor for a robot, because it affects how accurately and rapidly a robot can perform a motion to accomplish a task constrained by spatial and temporal conditions. In this paper, we propose and derive a pseudo-index of motor performance (pIp to characterize robot motor capability with robot kinematics, dynamics and control taken into consideration. The proposed pIp provides a quantitative measure for a robot with revolute joints, which is inspired from an index of performance in Fitts’s law of human skills. Computer simulations and experiments on a PUMA 560 industrial robot were conducted to validate the proposed pIp for performing a motion accurately and rapidly.

  19. Measurement of the robot motor capability of a robot motor system: a Fitts's-law-inspired approach.

    Science.gov (United States)

    Lin, Hsien-I; Lee, C S George

    2013-07-02

    Robot motor capability is a crucial factor for a robot, because it affects how accurately and rapidly a robot can perform a motion to accomplish a task constrained by spatial and temporal conditions. In this paper, we propose and derive a pseudo-index of motor performance (pIp) to characterize robot motor capability with robot kinematics, dynamics and control taken into consideration. The proposed pIp provides a quantitative measure for a robot with revolute joints, which is inspired from an index of performance in Fitts's law of human skills. Computer simulations and experiments on a PUMA 560 industrial robot were conducted to validate the proposed pIp for performing a motion accurately and rapidly.

  20. Extended Measurement Capabilities of the Electron Proton Helium INstrument aboard SOHO - Understanding single detector count rates

    Science.gov (United States)

    Kühl, P.; Banjac, S.; Heber, B.; Labrenz, J.; Müller-Mellin, R.; Terasa, C.

    Forbush (1937) was the first to observe intensity decreases lasting for a few days utilizing ionization chambers. A number of studies on Forbush decreases (FDs) have been performed since then utilizing neutron monitors and space instrumentation. The amplitude of these variations can be as low as a few permil. Therefore intensity measurements need to be of high statistical accuracy. Richardson et al. (1996) suggested therefore to utilize the single counter measurements of the guard counters of the IMP 8 and Helios E6 instruments. Like the above mentioned instruments the Electron Proton Helium INstrument (EPHIN) provides single counting rates. During the extended solar minimum in 2009 its guard detector counted about 25000~counts/minute, allowing to determine intensity variations of less than 2 permil using 30 minute averages. We performed a GEANT 4 simulation of the instrument in order to determine the energy response of all single detectors. It is shown here that their energy thresholds are much lower than the ones of neutron monitors and therefore we developed a criterion that allows to investigate FDs during quiet time periods.

  1. Axiomatic definition of quantity as a basis for teaching metrology in Mechanical Engineering

    Science.gov (United States)

    Muravyov, S. V.; Ramamoorthy, B.

    2016-11-01

    In spite of satisfactory availability of didactical material, there exist some problems in teaching metrology that are conditioned by rather outdated common view on the role and position of this subject in the overall discipline of Mechanical Engineering, as well as in other engineering branches. In fact, in the last ten years, many changes have occurred in metrology both as a science itself and as a practical activity on measurement uniformity support. Terminology, concerning essential elements of measurement process and measurement situation, has been revised to a large extent. In the paper, certain recommendations are given on a shift of the subject teaching paradigm and its contents.

  2. The role of LATU as national metrology institute of Uruguay and its responsibilities

    Science.gov (United States)

    Robatto, O.; Quagliata, E.; Santo, C.; Sica, A.; Sponton, M.

    2013-09-01

    Laboratorio Tecnológico del Uruguay (LATU) is the National Metrology Institute of Uruguay and has the obligation to maintain the national standards stated by National Law 15298. At present LATU is acting as a secondary laboratory as well as a primary laboratory. LATU was ISO 17025:2005 DKD (Deutscher Kalibrierdienst) accredited from 2001 up to 2007. By that time LATU decided to support its Capabilities of Measurement and Calibration (CMCs) at CIPM-MRA (Mutual Recognition Arrangement between national metrology institutes (NMIs)) by peer assessment. A Peer Review has been done in 2008 in order to get the QSTF (Sistema Interamericano de Metrología, Quality System Task Force) approval. "New "CMCs for Industrial Thermometers have been approved by the JCRB on September 2010. CMCs claimed for Standard Resistance Platinum Thermometers (SPRTs) calibration at fixed points have not been approved yet because there were some requirements of traceability of employed cells that were not fulfilled but will be solved properly. The declared CMCs have been chosen by LATU in order to cover the increasing calibration services required by the industry and the secondary calibration laboratories. To demonstrate its technical competence an support its declared "CMCs" LATU has also participated at bilateral and regional comparisons. In recent years LATU, the National Accreditation Body (OUA), the Standards Institute, the National Institute of Quality and Compliance Bodies have become Members of a new Institution to strengthen the Quality Infrastructure of the country (SUNAMEC). As part of this new activities, LATU is giving training courses to the secondary laboratories performing calibrations in temperature that want to get accredited by the National Accreditation Body and to act as Technical Evaluators or Auditors when required by OUA. It is expected, that in the future and in the frame of new accredited and recognized temperature calibration laboratories, LATU could strengthen its

  3. Adobe Flash as a medium for online experimentation: a test of reaction time measurement capabilities.

    Science.gov (United States)

    Reimers, Stian; Stewart, Neil

    2007-08-01

    Adobe Flash can be used to run complex psychological experiments over the Web. We examined the reliability of using Flash to measure reaction times (RTs) using a simple binary-choice task implemented both in Flash and in a Linux-based system known to record RTs with millisecond accuracy. Twenty-four participants were tested in the laboratory using both implementations; they also completed the Flash version on computers of their own choice outside the lab. RTs from the trials run on Flash outside the lab were approximately 20 msec slower than those from trials run on Flash in the lab, which in turn were approximately 10 msec slower than RTs from the trials run on the Linux-based system (baseline condition). RT SDs were similar in all conditions, suggesting that although Flash may overestimate RTs slightly, it does not appear to add significant noise to the data recorded.

  4. Numerical simulations on efficiency and measurement of capabilities of BGO detectors for high energy gamma ray

    CERN Document Server

    Wen Wan Xin

    2002-01-01

    The energy resolution and time resolution of two phi 75 x 100 BGO detectors for high energy gamma ray newly made were measured with sup 1 sup 3 sup 7 Cs and sup 6 sup 0 Co resources. The two characteristic gamma rays of high energy emitted from the thermal neutron capture of germanium in BGO crystal were used for the energy calibration of gamma spectra. The intrinsic photopeak efficiency, single escape probability and double escape probabilities of BGO detectors in photon energy range of 4-30 MeV are numerically calculated with GEANT code. The real count response and count ratio of the uniformly distributed incident photons in energy range of 0-30 MeV are also calculated. The distortion of gamma spectra caused by the photon energy loss extension to lower energy in detection medium is discussed

  5. Multi-beam Lidar Instrument Design, Measurement Capabilities, and Technical Readiness

    Science.gov (United States)

    Blair, B.; Ranson, J.; Dubayah, R.; Coyle, B.; Salerno, C.

    2007-12-01

    A multi-beam Laser Altimeter has been designed and studied at NASA Goddard Space Flight Center and the critical technologies have developed and tested resulting in a mature and technically ready instrument approach. The instrument consists of three separate beams each providing a near-contiguous profile of 25 m diameter laser footprints. The across-track separation of the beams can be design includes a high-quality GPS receiver for providing precise orbital position information and a state-of-the-art Star Tracker and Inertial Measurement Unit to provide precise and accurate laser beam pointing knowledge. The digitizer-based ranging system will provide ranging to bare surfaces with ~3 cm range precision. The return waveforms will also provide vegetation height measurements with ~1 m of accuracy. The laser transmitters have been fully developed, characterize, and tested. Engineering Test Unit has been built at NASA/GSFC for environmental testing. Test units of the laser demonstrated 5 Billion shots without damage and diode testing indicates lifetimes of ~10 Billion shots per laser can be expected. A new waveform digitizer has been developed with improvements in sampling rate and dynamic range over the ICESat digitizer system, thus allowing higher quality waveforms to be collected, which is critical importantly for vegetation studies. This multi-beam Lidar design is the basis for the Lidar on the DESDynI (Deformation, Ecosystem Structure, and Dynamics of Ice) mission described in the NRC Decadal Survey Report that consists of a Multi-beam Lidar and an L-band InSAR to be launched in the 2010-2013 timeframe.

  6. Comparison of ⁹⁰Y and ¹⁷⁷Lu measurement capability in UK and European hospitals.

    Science.gov (United States)

    Fenwick, Andrew; Baker, Michaela; Ferreira, Kelley; Keightley, John

    2014-05-01

    Comparison exercises involving (90)Y and (177)Lu were performed during 2009 and 2012, respectively, to assess the measurement capability of hospitals in the UK and Europe. The results from the measurement of a typical liquid solution of (90)Y show that only 40% of participants could measure the solution to within 5% of the certificated value and that a significant -6% bias was present due to the use of non-standard geometries for the calibration of equipment. The results from the measurement of a standard liquid solution of (177)Lu show that 81% of participants could measure to within 5% of the certificated value and in fact 65% of these results were within 2% of the certificated value, showing administered activities can be far more accurately measured for (177)Lu than for (90)Y and that (177)Lu has a far smaller geometry dependence. These studies were performed to identify specific measurement issues in the user community and to identify areas where future research should be focused. In addition to this the work allows the participants to adjust measurement practice and identify key measurement issues.

  7. Statistical analysis of the metrological properties of float glass

    Science.gov (United States)

    Yates, Brian W.; Duffy, Alan M.

    2008-08-01

    The radius of curvature, slope error, surface roughness and associated height distribution and power spectral density of uncoated commercial float glass samples have been measured in our Canadian Light Source Optical Metrology Facility, using our Micromap-570 surface profiler and long trace profilometer. The statistical differences in these parameters have been investigated between the tin and air sides of float glass. The effect of soaking the float glass in sulfuric acid to try to dissolve the tin contamination has also been investigated, and untreated and post-treatment surface roughness measurements compared. We report the results of our studies on these float glass samples.

  8. Multi-petahertz electronic metrology.

    Science.gov (United States)

    Garg, M; Zhan, M; Luu, T T; Lakhotia, H; Klostermann, T; Guggenmos, A; Goulielmakis, E

    2016-10-20

    The frequency of electric currents associated with charge carriers moving in the electronic bands of solids determines the speed limit of electronics and thereby that of information and signal processing. The use of light fields to drive electrons promises access to vastly higher frequencies than conventionally used, as electric currents can be induced and manipulated on timescales faster than that of the quantum dephasing of charge carriers in solids. This forms the basis of terahertz (10(12) hertz) electronics in artificial superlattices, and has enabled light-based switches and sampling of currents extending in frequency up to a few hundred terahertz. Here we demonstrate the extension of electronic metrology to the multi-petahertz (10(15) hertz) frequency range. We use single-cycle intense optical fields (about one volt per ångström) to drive electron motion in the bulk of silicon dioxide, and then probe its dynamics by using attosecond (10(-18) seconds) streaking to map the time structure of emerging isolated attosecond extreme ultraviolet transients and their optical driver. The data establish a firm link between the emission of the extreme ultraviolet radiation and the light-induced intraband, phase-coherent electric currents that extend in frequency up to about eight petahertz, and enable access to the dynamic nonlinear conductivity of silicon dioxide. Direct probing, confinement and control of the waveform of intraband currents inside solids on attosecond timescales establish a method of realizing multi-petahertz coherent electronics. We expect this technique to enable new ways of exploring the interplay between electron dynamics and the structure of condensed matter on the atomic scale.

  9. Measurement Uncertainty Evaluation in Dimensional X-ray Computed Tomography Using the Bootstrap Method

    DEFF Research Database (Denmark)

    Hiller, Jochen; Genta, Gianfranco; Barbato, Giulio

    2014-01-01

    Industrial applications of computed tomography (CT) for dimensional metrology on various components are fast increasing, owing to a number of favorable properties such as capability of non-destructive internal measurements. Uncertainty evaluation is however more complex than in conventional measu...

  10. Distributed large-scale dimensional metrology new insights

    CERN Document Server

    Franceschini, Fiorenzo; Maisano, Domenico

    2011-01-01

    Focuses on the latest insights into and challenges of distributed large scale dimensional metrology Enables practitioners to study distributed large scale dimensional metrology independently Includes specific examples of the development of new system prototypes

  11. Joint Research on Scatterometry and AFM Wafer Metrology

    NARCIS (Netherlands)

    Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.

    2011-01-01

    Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both

  12. On the capability of IASI measurements to inform about CO surface emissions

    Directory of Open Access Journals (Sweden)

    S. Szopa

    2009-11-01

    Full Text Available Between July and November 2008, simultaneous observations were conducted by several orbiting instruments that monitor carbon monoxide in the atmosphere, among them the Infrared Atmospheric Sounding Instrument (IASI and Measurements Of Pollution In The Troposphere (MOPITT. In this paper, the concentration retrievals at about 700 hPa from these two instruments are successively used in a variational Bayesian system to infer the global distribution of CO emissions. Starting from a global emission budget of 479 Tg for the considered period, the posterior estimate of CO emissions using IASI retrievals gives a total of 643 Tg, which is in close agreement with the budget calculated with version 3 of the MOPITT data (649 Tg. The regional totals are also broadly consistent between the two inversions. Even though our theoretical error budget indicates that IASI constrains the emissions slightly less than MOPITT, because of lesser sensitivity in the lower troposphere, these first results indicate that IASI may play a major role in the quantification of the emissions of CO.

  13. Capabilities for measuring the diffusivity of a single molecule by recycling it in a nanochannel

    Science.gov (United States)

    Wang, Bo; Davis, Lloyd

    2014-03-01

    Analysis of the fractions of fluorescently labeled molecules with different diffusivities within a microliter drop of solution is often used for high-throughput screening of molecular binding interactions in pharmaceutical drug discovery research. Assays frequently employ fluorescence correlation spectroscopy, an ensemble technique that is able to resolve fast diffusing small ligands from those bound to much larger biomolecules with considerably slower diffusion. Single-molecule measurements have the potential to resolve species with different diffusivities and to count the numbers of molecules of each species. Single-molecule recycling in a nanochannel, which entails detection of bursts of fluorescence photons from the repeated passage of a molecule through a focused laser beam as the flow along a nanochannel is periodically alternated, can be used to determine the diffusivity of a single molecule from the fluctuations in the intervals between successive detections. We discuss Monte Carlo studies to determine favorable experimental conditions for determining single-molecule diffusivities, together with a weighted-sliding-sum photon burst detection algorithm for flow-control and maximum-likelihood based analysis of recycle times. We also discuss incorporation of the algorithms into our experimental apparatus for single-molecule recycling, which uses a LabView real-time system for photon count analysis and flow control.

  14. Flexural Capability of Patterned Transparent Conductive Substrate by Performing Electrical Measurements and Stress Simulations

    Directory of Open Access Journals (Sweden)

    Chang-Chun Lee

    2016-10-01

    Full Text Available The suitability of stacked thin films for next-generation display technology was analyzed based on their properties and geometrical designs to evaluate the mechanical reliability of transparent conducting thin films utilized in flexural displays. In general, the high bending stress induced by various operation conditions is a major concern regarding the mechanical reliability of indium–tin–oxide (ITO films deposited on polyethylene terephthalate (PET substrates; mechanical reliability is commonly used to estimate the flexibility of displays. However, the pattern effect is rarely investigated to estimate the mechanical reliability of ITO/PET films. Thus, this study examined the flexible content of patterned ITO/PET films with two different line widths by conducting bending tests and sheet resistance measurements. Moreover, a stress–strain simulation enabled by finite element analysis was performed on the patterned ITO/PET to explore the stress impact of stacked film structures under various levels of flexural load. Results show that the design of the ITO/PET film can be applied in developing mechanically reliable flexible electronics.

  15. Fabrication, performance, and figure metrology of epoxy-replicated aluminum foils for hard x-ray focusing multilayer-coated segmented conical optics

    DEFF Research Database (Denmark)

    Jimenez-Garate, M.A.; Craig, W.W.; Hailey, C.J.;

    2000-01-01

    telescope HPD, we designed a figure metrology system and a new mounting technique. We describe a cylindrical metrology system built for fast axial and roundness figure measurement of hard x-ray conical optics. These developments lower cost and improve the optics performance of the HEFT (high-energy focusing...

  16. Fabrication, performance, and figure metrology of epoxy-replicated aluminum foils for hard x-ray focusing multilayer-coated segmented conical optics

    DEFF Research Database (Denmark)

    Jimenez-Garate, M.A.; Craig, W.W.; Hailey, C.J.

    2000-01-01

    telescope HPD, we designed a figure metrology system and a new mounting technique. We describe a cylindrical metrology system built for fast axial and roundness figure measurement of hard x-ray conical optics. These developments lower cost and improve the optics performance of the HEFT (high-energy focusing...

  17. Inter-agency communication and operations capabilities during a hospital functional exercise: reliability and validity of a measurement tool.

    Science.gov (United States)

    Savoia, Elena; Biddinger, Paul D; Burstein, Jon; Stoto, Michael A

    2010-01-01

    As proxies for actual emergencies, drills and exercises can raise awareness, stimulate improvements in planning and training, and provide an opportunity to examine how different components of the public health system would combine to respond to a challenge. Despite these benefits, there remains a substantial need for widely accepted and prospectively validated tools to evaluate agencies' and hospitals' performance during such events. Unfortunately, to date, few studies have focused on addressing this need. The purpose of this study was to assess the validity and reliability of a qualitative performance assessment tool designed to measure hospitals' communication and operational capabilities during a functional exercise. The study population included 154 hospital personnel representing nine hospitals that participated in a functional exercise in Massachusetts in June 2008. A 25-item questionnaire was developed to assess the following three hospital functional capabilities: (1) inter-agency communication; (2) communication with the public; and (3) disaster operations. Analyses were conducted to examine internal consistency, associations among scales, the empirical structure of the items, and inter-rater agreement. Twenty-two questions were retained in the final instrument, which demonstrated reliability with alpha coefficients of 0.83 or higher for all scales. A three-factor solution from the principal components analysis accounted for 57% of the total variance, and the factor structure was consistent with the original hypothesized domains. Inter-rater agreement between participants' self reported scores and external evaluators' scores ranged from moderate to good. The resulting 22-item performance measurement tool reliably measured hospital capabilities in a functional exercise setting, with preliminary evidence of concurrent and criterion-related validity.

  18. Advanced gate CDU control in sub-28nm node using poly slot process by scatterometry metrology

    Science.gov (United States)

    Tzai, Wei-Jhe; Chen, Howard; Lin, Jun-Jin; Huang, Yu-Hao; Yu, Chun-Chi; Lin, Ching-Hung Bert; Yoo, Sungchul; Huang, Chien-Jen Eros; Mihardja, Lanny

    2013-04-01

    Scatterometry-based metrology is a well proven method to measure and monitor the critical dimensions of interest in advanced sub-28nm process development and high volume manufacturing [1][3][4][6][7]. In this paper, a proposed solution to control and achieve the optimal gate critical dimension uniformity (CDU) was explored. The proposed solution is named a novel scatterometry slot gate CDU control flow. High performance measurement and control during the slot gate step is critical as it directly controls the poly line cut profile to the active area which then directly impacts the final device performance. The proposed flow incorporates scatterometry-based CD (SCD) measurement feedback and feed forward to the Automation Process Control (APC) system, further process recipe fine tuning utilizing the data feedback and forward, and two dimensional (2D) and three dimensional (3D) scatterometry-based CD (SCD) measurement of gate after developer inspection (ADI) and after etch inspection (AEI) [1]. The methodologies and experiment results presented in this study started from the process development through the SCD model optimization of the DOE wafers, to the final implementation of the process control flow and measurement loop into the production line to evaluate its capability for long term in-line monitoring in high volume manufacturing environment. The result showed significant improvement in the gate CD uniformity that met the sub-28nm process manufacturing requirement.

  19. Coherent double-color interference microscope for traceable optical surface metrology

    Science.gov (United States)

    Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

    2016-06-01

    Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

  20. Semiconductor strain metrology principles and applications

    CERN Document Server

    Wong, Terence KS

    2012-01-01

    This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this e-book specifically discusses strain metrol

  1. Using entanglement against noise in quantum metrology.

    Science.gov (United States)

    Demkowicz-Dobrzański, Rafal; Maccone, Lorenzo

    2014-12-19

    We analyze the role of entanglement among probes and with external ancillas in quantum metrology. In the absence of noise, it is known that unentangled sequential strategies can achieve the same Heisenberg scaling of entangled strategies and that external ancillas are useless. This changes in the presence of noise; here we prove that entangled strategies can have higher precision than unentangled ones and that the addition of passive external ancillas can also increase the precision. We analyze some specific noise models and use the results to conjecture a general hierarchy for quantum metrology strategies in the presence of noise.

  2. Single shot interferogram analysis for optical metrology.

    Science.gov (United States)

    Singh, Mahendra Pratap; Singh, Mandeep; Khare, Kedar

    2014-10-10

    We report a novel constrained optimization method for single shot interferogram analysis. The unknown test wavefront is estimated as a minimum L2-norm squared solution whose phase is constrained to the space spanned by a finite number of Zernike polynomials. Using a single frame from standard phase shifting datasets, we demonstrate that our approach provides a phase map that matches with that generated using phase shifting algorithms to within λ/100  rms error. Our simulations and experimental results suggest the possibility of a simplified low-cost high quality optical metrology system for performing routine metrology tests involving smooth surface profiles.

  3. Advances in speckle metrology and related techniques

    CERN Document Server

    Kaufmann, Guillermo H

    2010-01-01

    Speckle metrology includes various optical techniques that are based on the speckle fields generated by reflection from a rough surface or by transmission through a rough diffuser. These techniques have proven to be very useful in testing different materials in a non-destructive way. They have changed dramatically during the last years due to the development of modern optical components, with faster and more powerful digital computers, and novel data processing approaches. This most up-to-date overview of the topic describes new techniques developed in the field of speckle metrology over the l

  4. Advanced in situ metrology for x-ray beam shaping with super precision.

    Science.gov (United States)

    Wang, Hongchang; Sutter, John; Sawhney, Kawal

    2015-01-26

    We report a novel method for in situ metrology of an X-ray bimorph mirror by using the speckle scanning technique. Both the focusing beam and the "tophat" defocussed beam have been generated by optimizing the bimorph mirror in a single iteration. Importantly, we have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach accuracy in the range of two nanoradians. When compared with conventional ex-situ metrology techniques, the method enables a substantial increase of around two orders of magnitude in the angular sensitivity and opens the way to a previously inaccessible region of slope error measurement. Such a super precision metrology technique will be beneficial for both the manufacture of polished mirrors and the optimization of beam shaping.

  5. Fleet matching performance for multiple registration measurement tools

    Science.gov (United States)

    Beyer, D.; Bläsing, C.; Boehm, K.; Heisig, S.; Seidel, D.

    2013-09-01

    Currently semiconductor industry drives the 193nm lithography to its limits, using techniques like double exposure, double patterning, mask-source optimisation and inverse lithography. These requirements trend to full in-die measurement capability of photomask metrology for registration. Especially, overlay becomes more and more critical and must be ensured on every die. For this, Carl Zeiss SMS has developed the next generation photomask registration and overlay metrology tool PROVE which is already well established in the market. To ensure in-die measurement capability, sophisticated image analysis methods based on 2D correlations have been developed. A key component for registration tool users is the cross site manufacturing flexibility given by the matching capability of all its metrology tools. Therefore all PROVE tools offer a tool matching procedure based on 2D Golden Grid references. In this paper we first review the optimal length standard and golden grid matching procedures of modern registration metrology tools. Systematic errors in fleet matching based on illumination differences, thermal expansionbased issues or line width roughness are addressed. The tool matching performance of PROVE tools is demonstrated by comparing up to 7 different tools. All tools are well within accuracy and long-term repeatability specification which considerably reduces the statistical error contribution of the tool matching performance. For grid matched tools the final cross tool registration error is shown to be below 1nm.

  6. 支撑光学制造的几何量计量技术%Dimensional Metrology at PTB to Support Optical Fabrication

    Institute of Scientific and Technical Information of China (English)

    戴高良; SCHULZ Michael; EHRET Gerd; DANZEBRINK Hans-Ulrich; FLUEGGE Jens; BOSSE Harald

    2011-01-01

    几何量计量技术大量应用于光学制造业以检测零件质量和控制生产过程,是光学制造业的核心技术,涉及微纳米结构的几何量计量以及平面、球面、非球面、直纹曲面及自由曲面的面形计量.本文综述了德国联邦物理技术研究院支撑光学制造的部分计量技术.介绍了一种测量范围为25 mm×25 mm×5 mm的计量型大范围原子力显微镜(AFM),可灵活多样地测量各种微纳结构.介绍了一种新颖的AFM探针(ACP),可实现微纳结构侧壁形貌的直接、无损测量.介绍了一种应用Flared AFM探针的真三维AFM及其用于减少针尖磨损的矢量探测技术,可应用于各种纳米结构的真三维测量.介绍了可用于平面和中等曲面面形绝对测量的两种方法:差分型激光束偏转法和可溯源多路传感器法(TMS).讨论了面形测量中存在的挑战性难题.介绍了可用于面形测量的高精度三坐标测量机.%Dimensional metrology is the enabling technology required not only for ensuring the quality of optical products but also for monitoring/controlling the manufacturing processes.Dimensional metrology of micro and nano structures and form metrology of flat,spherical,aspherical,ruled and free form surfaces are needed.This paper introduced some dimensional metrology research activities at PTB to support optical fabrication.A metrological large range atomic force microscope (AFM) with a capable measurement volume of 25 mm × 25 mm × 5 mm was introduced for versatile measurements of micro/nano structures.A kind of assembled cantilever probe (ACP) which is applicable for direct and non-destructive sidewall measurements was presented.A true 3D AFM using flared AFM probes was described by specially developed vector approaching probe (VAP) strategy for true 3D measurements of nano structures.Difference deflectometry and traceable multi sensor (TMS) methods applicable for absolute form metrology of flat to moderately curved

  7. Application of A 10 μg tin microcalorimeter in the field of low-energy X-ray metrology

    Science.gov (United States)

    Bobin, C.; Bouchard, J.; Cassette, P.; Leblanc, E.

    2000-04-01

    LNHB (Laboratoire National Henri Becquerel) is responsible for the French radioactivity standards and the updating of the radionuclide table containing all available atomic and nuclear data. This implies decay scheme studies which require high-energy resolution spectrometry and also activity measurements using low threshold and high detection efficiency detectors. To explore the capabilities of cryogenic detectors for low-energy X-ray metrology, there has been a collaboration with the Institut d'Astrophysique Spatiale in order to develop a fast microcalorimeter with a tin absorber which guarantees a detection efficiency greater than 99.9% in the 1-6 keV energy range. A feasability study of a decay scheme analysis was carried out on this microcalorimeter with a 139Ce source; preliminary results on relative intensities are presented.

  8. Stable Similariton Generation in an All-Fiber Hybrid Mode-Locked Ring Laser for Frequency Metrology.

    Science.gov (United States)

    Lazarev, Vladimir; Krylov, Alexander; Dvoretskiy, Dmitriy; Sazonkin, Stanislav; Pnev, Alexey; Leonov, Stanislav; Shelestov, Dmitriy; Tarabrin, Mikhail; Karasik, Valeriy; Kireev, Alexey; Gubin, Mikhail

    2016-07-01

    Ultrashort pulse lasers constitute an important tool in the emerging field of optical frequency metrology and are enabling unprecedented measurement capabilities and new applications in a wide range of fields, including precision spectroscopy, atomic clocks, ultracold gases, and molecular fingerprinting. We demonstrate the generation of stable 127-fs self-similar pulses at a central wavelength of 1560 nm with 7.14-mW average output power. Similariton lasers have a low repetition rate deviation in the averaging time interval [Formula: see text], a low relative intensity noise [Formula: see text] (30 Hz to 10 kHz), a narrow single comb line width of 32 kHz, and high reliability. Thus, such lasers are highly promising for further development of the stabilized combs and open up a robust and substantially simplified route to synthesizing low-noise microwaves.

  9. Target-Tracking Camera for a Metrology System

    Science.gov (United States)

    Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

    2009-01-01

    An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

  10. Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

    Science.gov (United States)

    Bösemann, Werner

    2016-06-01

    New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  11. INDUSTRIAL PHOTOGRAMMETRY - ACCEPTED METROLOGY TOOL OR EXOTIC NICHE

    Directory of Open Access Journals (Sweden)

    W. Bösemann

    2016-06-01

    Full Text Available New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]. This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM’s. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  12. Monitoring climate from space: a metrology perspective

    Science.gov (United States)

    Revercomb, Hank; Best, Fred; Tobin, Dave; Knuteson, Bob; Smith, Nadia; Smith, William L.; Weisz, Elisabeth

    2016-05-01

    Application of the principles of metrology for the NASA Climate Absolute Radiance and Refractivity Observatory (CLARREO) infrared high spectral resolution measurements is presented, starting with the use of a Standard International (SI) reference source on orbit, developing uncertainty traceability for intercalibration to other spaceborne sensors, and finally tracing the direct effects of radiance uncertainty on climate products originating from state parameter retrievals. The Absolute Radiance Interferometer (ARI) IR prototype employs an On-orbit Absolute Radiance Standard (OARS), developed under the NASA Instrument Incubator Program for CLARREO, for on-orbit calibration verification to better than 0.1 K 3-sigma. The OARS consists of a variable temperature, high emissivity blackbody with temperature calibration established to better than 16 mK on-orbit and provision for on-orbit emissivity monitoring. The temperature scale is established using miniature melt cells of Ga, H2O, and Hg. Transferring the high accuracy of ARI measurements to other IR instruments, especially the high spectral resolution operational sounders (AIRS, CrIS and IASI), is an important objective of CLARREO. The mathematical approach to rigorous traceability of sampling uncertainties is explained and applied in simulations of the intercalibration process. Results show that it will be possible to make intercomparisons of better than 0.05 K 3-sigma with just 6 months of observations from a single CLARREO in true polar orbit. Finally, the effects of radiance perturbations representing realistic uncertainties (for the CrIS on Suomi NPP) on retrieved temperature and water vapor profiles are evaluated. The results demonstrate a stable, physically reasonable impact of Dual regression retrievals.

  13. Reference Materials for Food and Nutrition Metrology: Past, Present and Future

    Science.gov (United States)

    Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970’s the first “biological” RM of Bowens Kale, as well as Orchard Leaves and Bovine Liver SRMs, from the ...

  14. Signal processing for order 10 pm accuracy displacement metrology in real-world scientific applications

    Science.gov (United States)

    Halverson, Peter G.; Loya, Frank M.

    2004-01-01

    This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

  15. NASA SMD/STMD Joint Study on Science Measurements and Technology Capability Potential of SmallSats

    Science.gov (United States)

    Norton, C. D.; Seablom, M. S.; Petro, A. J.; Bonniksen, C. K.; Ruf, C. S.; Klumpar, D. M.; Van Sant, J. T.

    2015-12-01

    NASA's Science Mission Directorate (SMD) and Space Technology Directorate (STMD) initiated a joint study to explore strategic approaches to the development of platform technologies and new measurement approaches in Earth, Planetary, Heliophysics, and Astrophysics science enabled by small satellites (including CubeSat class systems). The agency has made investments though various solicitations within SMD and STMD, but as system capabilities continue to grow and as exploration concepts become more ambitious there was a need to formally asses the role Smallsats could play from technology maturation through Decadal Survey science in a coordinated fashion within the parameters of reliability, cost, design time and measurement requirement assessment among other topics. This talk will review the activities of the study team as well as its findings in the context of the benefits a small satellite program could contribute to multiple aspects of NASA's scientific and technology development objectives.

  16. Metrology System for a Large, Somewhat Flexible Telescope

    Science.gov (United States)

    Liebe, Carl Christian; Bartman, Randall; Cook, Walter; Craig, William

    2009-01-01

    A proposed metrology system would be incorporated into a proposed telescope that would include focusing optics on a rigid bench connected via a deployable mast to another rigid bench holding a focal-plane array of photon counting photodetectors. Deformations of the deployable mast would give rise to optical misalignments that would alter the directions (and, hence, locations) of incidence of photons on the focal plane. The metrology system would measure the relative displacement of the focusing- optics bench and the focal-plane array bench. The measurement data would be used in post-processing of the digitized photodetector outputs to compensate for the mast-deformation-induced changes in the locations of incidence of photons on the focal plane, thereby making it possible to determine the original directions of incidence of photons with greater accuracy. The proposed metrology system is designed specifically for the Nuclear Spectroscopic Telescope Array (NuSTAR) a proposed spaceborne x-ray telescope. The basic principles of design and operation are also applicable to other large, somewhat flexible telescopes, both terrestrial and spaceborne. In the NuSTAR, the structural member connecting the optical bench and the photodetector array would be a 10-m-long deployable mast, and there is a requirement to keep errors in measured directions of incidence of photons below 10 arc seconds (3 sigma). The proposed system would include three diode lasers that would be mounted on the focusing-optics bench. For clarity, only one laser is shown in the figure, which is a greatly simplified schematic diagram of the system. Each laser would be aimed at a position-sensitive photodiode that would be mounted on the detector bench alongside the aforementioned telescope photodetector array. The diode lasers would operate at a wavelength of 830 nm, each at a power of 200 mW. Each laser beam would be focused to a spot of .1-mm diameter on the corresponding position-sensitive photodiode. To

  17. Noninvasive spatial metrology of single-atom devices.

    Science.gov (United States)

    Mohiyaddin, Fahd A; Rahman, Rajib; Kalra, Rachpon; Klimeck, Gerhard; Hollenberg, Lloyd C L; Pla, Jarryd J; Dzurak, Andrew S; Morello, Andrea

    2013-05-01

    The exact location of a single dopant atom in a nanostructure can influence or fully determine the functionality of highly scaled transistors or spin-based devices. We demonstrate here a noninvasive spatial metrology technique, based on the microscopic modeling of three electrical measurements on a single-atom (phosphorus in silicon) spin qubit device: hyperfine coupling, ground state energy, and capacitive coupling to nearby gates. This technique allows us to locate the qubit atom with a precision of ±2.5 nm in two directions and ±15 nm in the third direction, which represents a 1500-fold improvement with respect to the prefabrication statistics obtainable from the ion implantation parameters.

  18. Coordinate metrology of a primary surface composite panel from the Large Millimeter Telescope

    Science.gov (United States)

    Gale, David M.; Lucero Álvarez, Maribel; Cabrera Cuevas, Lizeth; Leon-Huerta, Andrea; Arizmendi Reyes, Edgar; Icasio Hernández, Octavio; Castro Santos, David; Hernández Ríos, Emilio; Tecuapetla Sosa, Esteban; Tzile Torres, Carlos; Viliesid Alonso, Miguel

    2016-07-01

    The Large Millimeter Telescope (LMT) is a single-dish fully-steerable radio telescope presently operating with a 32.5 m parabolic primary reflector, in the process of extension to 50 m. The project is managed by the Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE) in México, and the University of Massachusetts Amherst, USA. A laminated surface panel from the LMT primary reflector has been subjected to a surface measurement assay at Mexico's National Metrology Center (CENAM). Data obtained using a coordinate measuring machine and laser tracker owned by CENAM is compared with measurements using an identical model laser tracker and the photogrammetry technique, the latter systems owned and operated by the LMT. All measurements were performed within the controlled metrology environment at CENAM. The measurement exercise is intended to prepare the groundwork for converting this spare surface panel into a calibrated work-piece. The establishment of a calibrated work-piece provides quality assurance for metrology through measurement traceability. It also simplifies the evaluation of measurement uncertainty for coordinate metrology procedures used by the LMT project during reflector surface qualification.

  19. Advanced Metrology for Characterization of Magnetic Tunnel Junctions

    DEFF Research Database (Denmark)

    Kjær, Daniel

    as it is believed to have the potential of becoming a truly universal memory solution dominant within all fields of memory application. A decade ago the company CAPRES A/S introduced the so-called CIPTech, which is a metrology tool utilizing micro four-point probes (M4PPs) and a method known as current in...... of this project has been to provide cheaper, faster and more precise metrology for MTJs. This goal has been achieved in part by the demonstration of a static field CIPT method, which allows us to reduce the measurement time by a factor of 5, by measuring only RA thus excluding TMR. This enhancement is obtained....... The standard deviation of the static in-line position error for measurements with Au coated electrodes on Ru thin film samples was found to be in the range from 3.9 nm to 7.5 nm. The standard deviation of the dynamic in-line position error was shown to be small ~3 Å and only detectable in measurements...

  20. Overlay metrology solutions in a triple patterning scheme

    Science.gov (United States)

    Leray, Philippe; Mao, Ming; Baudemprez, Bart; Amir, Nuriel

    2015-03-01

    Overlay metrology tool suppliers are offering today several options to their customers: Different hardware (Image Based Overlay or Diffraction Based Overlay), different target designs (with or without segmentation) or different target sizes (from 5 um to 30 um). All these variations are proposed to resolve issues like robustness of the target towards process variations, be more representative of the design or increase the density of measurements. In the frame of the development of a triple patterning BEOL scheme of 10 nm node layer, we compare IBO targets (standard AIM, AIMid and multilayer AIMid). The metrology tools used for the study are KLA-Tencor's nextgeneration Archer 500 system (scatterometry- and imaging-based measurement technologies on the same tool). The overlay response and fingerprint of these targets will be compared using a very dense sampling (up to 51 pts per field). The benefit of indie measurements compared to the traditional scribes is discussed. The contribution of process effects to overlay values are compared to the contribution of the performance of the target. Different targets are combined in one measurement set to benefit from their different strengths (performance vs size). The results are summarized and possible strategies for a triple patterning schemes are proposed.

  1. Absolute distance metrology for space interferometers

    NARCIS (Netherlands)

    Swinkels, B.L.; Latoui, A.; Bhattacharya, N.; Wielders, A.A.; Braat, J.J.M.

    2005-01-01

    Future space missions, among which the Darwin Space Interferometer, will consist of several free flying satellites. A complex metrology system is required to have all the components fly accurately in formation and have it operate as a single instrument. Our work focuses on a possible implementation

  2. Status of the Metrology Light Source

    Science.gov (United States)

    Klein, R.; Ulm, G.; Feikes, J.; Hartrott, M. v.; Wüstefeld, G.

    2010-06-01

    The Physikalisch-Technische Bundesanstalt (PTB), the German national metrology institute, has set up the low-energy electron storage ring Metrology Light Source (MLS) in close cooperation with the Helmholtz-Zentrum Berlin (HZB, formerly BESSY). This new storage ring has been in regular user operation since April 2008 and is dedicated to synchrotron-radiation-based metrology and technological developments in the far-IR/THz, IR, UV, VUV and EUV spectral range. The MLS has a double-bend-achromate lattice structure, injection is from a 105 MeV racetrack microtron. The electron energy can be ramped to any value from 105 MeV up to 630 MeV and the electron beam current covers the range from one stored electron (1 pA) up to 200 mA. The MLS is the first electron storage ring optimized for the generation of coherent synchrotron radiation, based on an electron bunch shortening mode. In this mode, MLS delivers coherent radiation in the far-IR/THz spectral range with enhanced intensity as compared to the normal mode of operation. Several beamlines are in operation or in construction, including one undulator beamline, bending magnet beamlines for the calibration of radiation sources and detectors and for reflectometry, an EUV metrology beamline and three IR/THz beamlines.

  3. [Metrological software of laser medical equipment].

    Science.gov (United States)

    Romashkov, A P; Glazov, A I; Tikhomirov, S V

    2001-01-01

    The paper considers the laser medical equipment situation that has established in Russia and that is characterized by the wide medical application of laser technologies and appropriate software and by inadequate development and imperfection of required metrological software and maintenance of laser equipment.

  4. Scaffold characterization using NLO multimodal microscopy in metrology for regenerative medicine

    Science.gov (United States)

    Mortati, Leonardo; Divieto, Carla; Boffitto, Monica; Sartori, Susanna; Ciardelli, Gianluca; Sassi, Maria Paola

    2013-09-01

    Metrology in regenerative medicine aims to develop traceable measurement technologies for characterizing cellular and macromolecule behaviour in regenerative medicine products and processes. One key component in regenerative medicine is using three-dimensional porous scaffolds to guide cells during the regeneration process. The regeneration of specific tissues guided by tissue analogous substrates is dependent on diverse scaffold architectural properties that can be derived quantitatively from scaffolds images. This paper discuss the results obtained with the multimodal NLO microscope recently realized in our laboratory in characterizing 3D tissue engineered (TE) scaffolds colonized from human Mesenchimal stem cells (hMSC), focusing on the study of the three-dimensional metrological parameters.

  5. 法制计量之我见%Some views on legal metrology

    Institute of Scientific and Technical Information of China (English)

    王明轩

    2014-01-01

    描述了法制计量的几种定义,并结合法制计量的定义,浅述了自己在计量管理方面如何完善法规建设、强化管理监督以及加强队伍建设的一些观点。%describes several kinds of definition, legal metrology and combined with the definition of legal metrology, in his own measurement management and how to perfect the construction of the rule of law, strengthen management oversight, and strengthen the team construction of some points.

  6. Review of the mathematical foundations of data fusion techniques in surface metrology

    Science.gov (United States)

    Wang, Jian; Leach, Richard K.; Jiang, X.

    2015-06-01

    The recent proliferation of engineered surfaces, including freeform and structured surfaces, is challenging current metrology techniques. Measurement using multiple sensors has been proposed to achieve enhanced benefits, mainly in terms of spatial frequency bandwidth, which a single sensor cannot provide. When using data from different sensors, a process of data fusion is required and there is much active research in this area. In this paper, current data fusion methods and applications are reviewed, with a focus on the mathematical foundations of the subject. Common research questions in the fusion of surface metrology data are raised and potential fusion algorithms are discussed.

  7. Nano-metrology and terrain modelling - convergent practice in surface characterisation

    Science.gov (United States)

    Pike, R.J.

    2000-01-01

    The quantification of magnetic-tape and disk topography has a macro-scale counterpart in the Earth sciences - terrain modelling, the numerical representation of relief and pattern of the ground surface. The two practices arose independently and continue to function separately. This methodological paper introduces terrain modelling, discusses its similarities to and differences from industrial surface metrology, and raises the possibility of a unified discipline of quantitative surface characterisation. A brief discussion of an Earth-science problem, subdividing a heterogeneous terrain surface from a set of sample measurements, exemplifies a multivariate statistical procedure that may transfer to tribological applications of 3-D metrological height data.

  8. Review of the Technical Metrological Regulation for flow computers and volume converters

    Science.gov (United States)

    Almeida, R. O.; Aguiar Júnior, E. A.; Costa-Felix, R. P. B.

    2016-07-01

    With the publication of Inmetro's regulation n° 373/2014, Inmetro presented the proposal to review the regulation of flow computers and volume converters, whose scope now includes fiscal measurement, ownership, custody transfer, among others, of hydrocarbons liquids and natural gas. This new proposal provides improvements to the legal metrological control of these instruments in Brazil, while also broaden the scope from the previous regulation, the Inmetro's regulation n° 64/2003. The purpose of this paper is to present these changes from a metrological point of view, and also clarify the transitional rules for the process.

  9. Sub-Angstrom electron microscopy for sub-Angstrom nano-metrology

    Energy Technology Data Exchange (ETDEWEB)

    O' Keefe, Michael A.; Allard, Lawrence F.

    2004-01-18

    The revolution in nanoscale science and technology requires instrumentation for observation and metrology - we must be able to see and measure what we build. Because nano-devices operate on the level of a few molecules, or even a few atoms, accurate atomic-scale imaging is called for. High-resolution aberration-corrected electron microscopes (both TEM and STEM) can provide valuable measurements at the sub-Angstrom level. Over the next decade, extension of TEM and STEM resolutions to half-Angstrom levels by next-generation aberration-corrected electron microscopes will advance the capabilities of these essential tools for atomic-scale structural characterization. Because improvements in resolution allow for separation of atom columns in many more projection directions, these microscopes will provide much improved three-dimensional characterization of the shape and internal structure of nanodevices and catalyst nanoparticles (perhaps even true 3-D imaging), and hence provide essential feedback in the nano-theory/construction/measurement loop.

  10. Metrology systems of Hobby-Eberly Telescope wide field upgrade

    Science.gov (United States)

    Lee, Hanshin; Hill, Gary J.; Cornell, Mark E.; Vattiat, Brian L.; Perry, Dave M.; Rafferty, Tom H.; Taylor, Trey; Hart, Michael; Rafal, Marc D.; Savage, Richard D.

    2012-09-01

    The Hobby-Eberly Telescope (HET) Wide-Field Upgrade (WFU) will be equipped with new closed-loop metrology systems to actively control the optical alignment of the new four-mirror Wide-Field Corrector (WFC) as it tracks sidereal motion with respect to the fixed primary mirror. These systems include a tip/tilt camera (TTCam), distance measuring interferometers (DMI), guide probes (GP), and wavefront sensors (WFS). While the TTCam and DMIs are to monitor the mechanical alignment of the WFC, the WFSs and GPs will produce direct measurement of the optical alignment of the WFC with respect to the HET primary mirror. Together, these systems provide fully redundant alignment and pointing information for the telescope, thereby keeping the WFC in focus and suppressing alignment driven field aberrations. In addition to these closed-loop metrology systems, we will have a pupil viewing camera (PVCam) and a calibration wavefront sensor (CWFS). The PVCam will be used for occasional reflectance measurement of the HET primary mirror segments in the standard R,G,B colors. The CWFS will provide the reference wavefront signal against which the other two WFS are calibrated. We describe the current snapshot of these systems and discuss lab/on-sky performance test results of the systems.

  11. Riesz transforms in statistical signal processing and their applications to speckle metrology: a review

    DEFF Research Database (Denmark)

    Wang, Wei; Zhang, Shun; Ma, Ning

    2015-01-01

    In this paper, a high-dimensional statistical signal processing is revisited with the aim of introducing the concept of vector signal representation derived from the Riesz transforms, which are the natural extension and generalization of the one-dimensional Hilbert transform. Under the new concepts...... of vector correlations proposed recently, the statistical properties of the vector signal representation for random signal are presented and some applications to speckle metrology developed recently are reviewed to demonstrate the unique capability of Riesz transforms....

  12. Spatial resolution measurements of the advanced radiographic capability x-ray imaging system at energies relevant to Compton radiography

    Science.gov (United States)

    Hall, G. N.; Izumi, N.; Landen, O. L.; Tommasini, R.; Holder, J. P.; Hargrove, D.; Bradley, D. K.; Lumbard, A.; Cruz, J. G.; Piston, K.; Lee, J. J.; Romano, E.; Bell, P. M.; Carpenter, A. C.; Palmer, N. E.; Felker, B.; Rekow, V.; Allen, F. V.

    2016-11-01

    Compton radiography provides a means to measure the integrity, ρR and symmetry of the DT fuel in an inertial confinement fusion implosion near peak compression. Upcoming experiments at the National Ignition Facility will use the ARC (Advanced Radiography Capability) laser to drive backlighter sources for Compton radiography experiments and will use the newly commissioned AXIS (ARC X-ray Imaging System) instrument as the detector. AXIS uses a dual-MCP (micro-channel plate) to provide gating and high DQE at the 40-200 keV x-ray range required for Compton radiography, but introduces many effects that contribute to the spatial resolution. Experiments were performed at energies relevant to Compton radiography to begin characterization of the spatial resolution of the AXIS diagnostic.

  13. Large batch dimensional metrology demonstrated in the example of a LIGA fabricated spring.

    Energy Technology Data Exchange (ETDEWEB)

    Aigeldinger, Georg; Skala, Dawn M.; Ceremuga, Joseph T.

    2004-04-01

    Deep x-ray lithography in combination with electroforming is capable of producing high precision metal parts in small lot series. This study deals with a high aspect ratio structure with overall dimensions on the order of 10 mm x 7 mm x 1.5 mm, with the smallest line width being 150 {micro}m. The lateral deviation from the design is to be kept to a minimum, preferably below 5 {micro}m. To ensure adequate quality control, a semi-automated metrology technique has been established to measure all parts. While the paper will give a brief overview of all involved techniques, it focuses on the method to measure the top and bottom of the parts and the top of geometries following the process. The instrument used is a View Engineering Voyager V6x12 microscope, which is fully programmable. The microscope allows direct measurement of geometries but also is capable of saving all captured data as point clouds. These point clouds play a central role when evaluating part geometry. After measuring the part, the point cloud is compared to the computer aided design (CAD) contour of the part, using a commercially available software package. The challenge of proper edge lighting on a nickel alloy part is evaluated by varying lighting conditions systematically. Results of two conditions are presented along with a set of optimized parameters. With the introduced set of tools, process flow can be monitored by measuring geometries, e.g. linewidths in every step of the process line. An example for such analysis is given. After delivery of a large batch of parts, extensive numbers of datasets were available allowing the evaluation of the variation of part geometries. Discussed in detail is the deviation from part top to part bottom geometries indicating swelling of the PMMA mold in the electroplating bath.

  14. Quantum metrology with spin cat states under dissipation.

    Science.gov (United States)

    Huang, Jiahao; Qin, Xizhou; Zhong, Honghua; Ke, Yongguan; Lee, Chaohong

    2015-12-09

    Quantum metrology aims to yield higher measurement precisions via quantum techniques such as entanglement. It is of great importance for both fundamental sciences and practical technologies, from testing equivalence principle to designing high-precision atomic clocks. However, due to environment effects, highly entangled states become fragile and the achieved precisions may even be worse than the standard quantum limit (SQL). Here we present a high-precision measurement scheme via spin cat states (a kind of non-Gaussian entangled states in superposition of two quasi-orthogonal spin coherent states) under dissipation. In comparison to maximally entangled states, spin cat states with modest entanglement are more robust against losses and their achievable precisions may still beat the SQL. Even if the detector is imperfect, the achieved precisions of the parity measurement are higher than the ones of the population measurement. Our scheme provides a realizable way to achieve high-precision measurements via dissipative quantum systems of Bose atoms.

  15. Capability Paternalism

    NARCIS (Netherlands)

    Claassen, R.J.G.

    2014-01-01

    A capability approach prescribes paternalist government actions to the extent that it requires the promotion of specific functionings, instead of the corresponding capabilities. Capability theorists have argued that their theories do not have much of these paternalist implications, since promoting c

  16. Optical metrology at the Optical Sciences Center: an historical review

    Science.gov (United States)

    Creath, Katherine; Parks, Robert E.

    2014-10-01

    The Optical Sciences Center (OSC) begun as a graduate-level applied optics teaching institution to support the US space effort. The making of optics representative of those used in other space programs was deemed essential. This led to the need for optical metrology: at first Hartmann tests, but almost immediately to interferometric tests using the newly invented HeNe laser. Not only were new types of interferometers needed, but the whole infrastructure that went with testing, fringe location methods, aberration removal software and contour map generation to aid the opticians during polishing needed to be developed. Over the last half century more rapid and precise methods of interferogram data reduction, surface roughness measurement, and methods of instrument calibration to separate errors from those in the optic have been pioneered at OSC. Other areas of research included null lens design and the writing of lens design software that led into the design of computer generated holograms for asphere testing. More recently work has been done on the reduction of speckle noise in interferograms, methods to test large convex aspheres, and a return to slope measuring tests to increase the dynamic range of the types of aspheric surfaces amenable to optical testing including free-form surfaces. This paper documents the history of the development of optical testing projects at OSC and highlights the contributions some of the individuals associated with new methods of testing and the infrastructure needed to support the testing. We conclude with comments about the future trends optical metrology.

  17. Development of laser materials processing and laser metrology techniques

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Cheol Jung; Chung, Chin Man; Kim, Jeong Mook; Kim, Min Suk; Kim, Kwang Suk; Baik, Sung Hoon; Kim, Seong Ouk; Park, Seung Kyu

    1997-09-01

    The applications of remote laser materials processing and metrology have been investigated in nuclear industry from the beginning of laser invention because they can reduce the risks of workers in the hostile environment by remote operation. The objective of this project is the development of laser material processing and metrology techniques for repairing and inspection to improve the safety of nuclear power plants. As to repairing, we developed our own laser sleeve welding head and innovative optical laser weld monitoring techniques to control the sleeve welding process. Furthermore, we designedand fabricated a 800 W Nd:YAG and a 150 W Excimer laser systems for high power laser materials processing in nuclear industry such as cladding and decontamination. As to inspection, we developed an ESPI and a laser triangulation 3-D profile measurement system for defect detection which can complement ECT and UT inspections. We also developed a scanning laser vibrometer for remote vibration measurement of large structures and tested its performance. (author). 58 refs., 16 tabs., 137 figs.

  18. EDITORIAL: Standard Materials and Metrology for Nanotechnology (SMAM-2)

    Science.gov (United States)

    Ichimura, Shingo; Kurosawa, Tomizo; Fujimoto, Toshiyuki; Nonaka, Hidehiko

    2007-09-01

    This issue of Measurement Science and Technology (MST) contains three papers presented at the second international symposium on Standard Materials and Metrology for Nanotechnology (SMAM-2), held in the Akihabara Convention Hall in Tokyo, Japan, on 25 and 26 May 2006. The SMAM symposium aims to emphasize the importance of standard materials and metrology (SM/M) for the development of nanotechnology, which is expected to be the most promising driving force for the development of advanced industrial science/technology in various fields. New fabrication processes based on nanotechnology will become really powerful when the processes are reproducible and reliable. The SM/M that have been developed for use in nano-scale characterization are therefore the key tools for the establishment of reliability in the areas of information, environment and biotechnology, where the application of nanotechnology is essential for their development. The symposium had four sessions featuring the most important issues in the field of SM/M: (I) Nanotechnology Standardization, (II) SM/M for Nano-particles and Nano-pores, (III) SM/M for Nanostructure Evaluation, (IV) SM/M for Thin-film Characterization. A total of 29 papers had been submitted to the SMAM-2 Publishing Committee and six papers were tentatively selected by the committee to forward to the MST editors for publication in this journal. The three papers published in this issue are epoch-making in that they present new methods and knowledge for the standard materials and metrology especially developed for nanotechnology. We hope the papers will show readers how important standard materials and metrology are for the development of nanotechnology. We appreciate very much the important contribution of those who refereed the manuscripts and we particularly want to thank the MST staff for helping in publishing this special feature. Finally we expect SMAM-3 to be held two years after SMAM-2 and we hope to attract many more participants and

  19. In-Line Detection and Measurement of Molecular Contamination in Semiconductor Process Solutions

    Science.gov (United States)

    Wang, Jason; West, Michael; Han, Ye; McDonald, Robert C.; Yang, Wenjing; Ormond, Bob; Saini, Harmesh

    2005-09-01

    This paper discusses a fully automated metrology tool for detection and quantitative measurement of contamination, including cationic, anionic, metallic, organic, and molecular species present in semiconductor process solutions. The instrument is based on an electrospray ionization time-of-flight mass spectrometer (ESI-TOF/MS) platform. The tool can be used in diagnostic or analytical modes to understand process problems in addition to enabling routine metrology functions. Metrology functions include in-line contamination measurement with near real-time trend analysis. This paper discusses representative organic and molecular contamination measurement results in production process problem solving efforts. The examples include the analysis and identification of organic compounds in SC-1 pre-gate clean solution; urea, NMP (N-Methyl-2-pyrrolidone) and phosphoric acid contamination in UPW; and plasticizer and an organic sulfur-containing compound found in isopropyl alcohol (IPA). It is expected that these unique analytical and metrology capabilities will improve the understanding of the effect of organic and molecular contamination on device performance and yield. This will permit the development of quantitative correlations between contamination levels and process degradation. It is also expected that the ability to perform routine process chemistry metrology will lead to corresponding improvements in manufacturing process control and yield, the ability to avoid excursions and will improve the overall cost effectiveness of the semiconductor manufacturing process.

  20. Laser metrology applied to the nuclear maintenance; Metrologia laser aplicada al mantenimiento nuclear

    Energy Technology Data Exchange (ETDEWEB)

    Garrido Garcia, J.; Sarti Fernandez, F.

    2012-07-01

    The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

  1. Proficiency testing in the light of a new rationale in metrology

    DEFF Research Database (Denmark)

    Heydorn, Kaj

    2008-01-01

    The novel proposed definition of measurement result in the international metrology vocabulary requires a revision of standards and guidelines for proficiency testing (PT), and a new approach to processing proficiency data is needed to test the ability of laboratories to present not only unbiased...

  2. Model-based optical metrology and visualization of 3-D complex objects

    Institute of Scientific and Technical Information of China (English)

    LIU Xiao-li; LI A-meng; ZHAO Xiao-bo; GAO Peng-dong; TIAN Jin-dong; PENG Xiang

    2007-01-01

    This letter addresses several key issues in the process of model-based optical metrology, including three dimensional (3D) sensing, calibration, registration and fusion of range images, geometric representation, and visualization of reconstructed 3D model by taking into account the shape measurement of 3D complex structures,and some experimental results are presented.

  3. Measurement system of high voltage and high current measurements at INMETRO - Brazilian Institute for Metrology, Standardization and Industrial Quality; Sistema de medicao de alta tensao e alta corrente do INMETRO - Brasil

    Energy Technology Data Exchange (ETDEWEB)

    Vitorio, Patricia Cals de O.; Franca, Ademir Martins de; Soares, Marco Aurelio; Pereira, Luiz Napoleao; Costa, Danielli Guimaraes; Moreira, Giselle Cobica; Nascimento, Paulo Roberto Mesquita [Instituto Nacional de Metrologia, Normalizacao e Qualidade Industrial (DIMCI/INMETRO), Duque de Caxias, RJ (Brazil). Diretoria de Metrologia Cientifica e Industrial], E-mail: latra@inmetro.gov.br

    2009-07-01

    This work presents the basic characteristics and uncertainties of the calibration equipment in high voltage and high current available at the INMETRO: system of measurement in alternating high voltage up to 200 kV, system of measurement in alternating current up to 2 k A, and system of measurement in continuous high voltage up to 150 kV.

  4. Round Robin for Optical Fiber Bragg Grating Metrology.

    Science.gov (United States)

    Rose, A H; Wang, C M; Dyer, S D

    2000-01-01

    NIST has administered the first round robin of measurements for optical fiber Bragg gratings. We compared the measurement of center wavelength, bandwidth, isolation, minimum relative transmittance, and relative group delay among several grating types in two industry groups, telecommunications and sensors. We found that the state of fiber Bragg grating metrology needs improvement in most areas. Specifically, when tunable lasers are used a filter is needed to remove broadband emissions from the laser. The linear slope of relative group delay measurements is sensitive to drift and systematic bias in the rf-modulation technique. The center wavelength measurement had a range of about 27 pm in the sensors group and is not adequate to support long-term structural monitoring applications.

  5. A novel design-based global CDU metrology for 1X nm node logic devices

    Science.gov (United States)

    Yoon, Young-Keun; Chung, Dong H.; Kim, Min-Ho; Seo, Jung-Uk; Kim, Byung-Gook; Jeon, Chan-Uk; Hur, JiUk; Cho, Wonil; Yamamoto, Tetsuya

    2013-09-01

    As dimension of device shrinks to 1X nm node, an extreme control of critical dimension uniformity (CDU) of masks becomes one of key techniques for mask and wafer fabrication. For memory devices, a large number of optical techniques have been studied and applied to mask production so far. The advantages of these methods are to eliminate the sampling dependency due to their high throughput, to minimize the local CD errors due to their large field of view (FOV) and to improve the correlation with wafer infield uniformity if they have scanner-like optics. For logic devices, however, CD-SEM has been a single solution to characterize CD performance of logic masks for a long time and simple monitoring patterns, instead of the cell patterns, have been measured to monitor the CD quality of masks. Therefore a global CDU of the mask tends to show its ambiguity because of the limited number of measurement sites and large local CD errors. An application of optical metrology for logic mask is a challenging task because patterns are more complex and random in shape and because there is no guarantee of finding patterns for CDU everywhere on the mask. CDU map still consists of the results from the indirect measurements and the traditional definition of uniformity, a statistical deviation of a typical pattern, seems to be unsuitable for logic CDU. A new definition of CDU is required in order to maximize the coverage area on a mask. In this study, we have focused of the possibility of measuring cell patterns and of using an inspection tool with data base handling capability, KLA Teron617, to find the areas and positions where the repeating patterns exist and the patterns which satisfy a certain set of condition and we have devised a new definition of CDU, which can handle multiple target CDs. Then we have checked the feasibility and validity of our new methodology through evaluation its fundamental performance such as accuracy, repeatability, and correlation with other CD metrology

  6. Development and Validation of Capabilities to Measure Thermal Properties of Layered Monolithic U-Mo Alloy Plate-Type Fuel

    Science.gov (United States)

    Burkes, Douglas E.; Casella, Andrew M.; Buck, Edgar C.; Casella, Amanda J.; Edwards, Matthew K.; MacFarlan, Paul J.; Pool, Karl N.; Smith, Frances N.; Steen, Franciska H.

    2014-07-01

    The uranium-molybdenum (U-Mo) alloy in a monolithic form has been proposed as one fuel design capable of converting some of the world's highest power research reactors from the use of high enriched uranium to low enriched uranium. One aspect of the fuel development and qualification process is to demonstrate appropriate understanding of the thermal-conductivity behavior of the fuel system as a function of temperature and expected irradiation conditions. The purpose of this paper is to verify functionality of equipment installed in hot cells for eventual measurements on irradiated uranium-molybdenum (U-Mo) monolithic fuel specimens, refine procedures to operate the equipment, and validate models to extract the desired thermal properties. The results presented here demonstrate the adequacy of the equipment, procedures, and models that have been developed for this purpose based on measurements conducted on surrogate depleted uranium-molybdenum (DU-Mo) alloy samples containing a Zr diffusion barrier and clad in aluminum alloy 6061 (AA6061). The results are in excellent agreement with thermal property data reported in the literature for similar U-Mo alloys as a function of temperature.

  7. The capability of fiber Bragg grating sensors to measure amputees' trans-tibial stump/socket interface pressures.

    Science.gov (United States)

    Al-Fakih, Ebrahim A; Osman, Noor Azuan Abu; Eshraghi, Arezoo; Adikan, Faisal Rafiq Mahamd

    2013-08-12

    This study presents the first investigation into the capability of fiber Bragg grating (FBG) sensors to measure interface pressure between the stump and the prosthetic sockets of a trans-tibial amputee. FBG element(s) were recoated with and embedded in a thin layer of epoxy material to form a sensing pad, which was in turn embedded in a silicone polymer material to form a pressure sensor. The sensor was tested in real time by inserting a heavy-duty balloon into the socket and inflating it by using an air compressor. This test was conducted to examine the sensitivity and repeatability of the sensor when subjected to pressure from the stump of the trans-tibial amputee and to mimic the actual environment of the amputee's Patellar Tendon (PT) bar. The sensor exhibited a sensitivity of 127 pm/N and a maximum FSO hysteresis of around ~0.09 in real-time operation. Very good reliability was achieved when the sensor was utilized for in situ measurements. This study may lead to smart FBG-based amputee stump/socket structures for pressure monitoring in amputee socket systems, which will result in better-designed prosthetic sockets that ensure improved patient satisfaction.

  8. The Capability of Fiber Bragg Grating Sensors to Measure Amputees’ Trans-Tibial Stump/Socket Interface Pressures

    Directory of Open Access Journals (Sweden)

    Faisal Rafiq Mahamd Adikan

    2013-08-01

    Full Text Available This study presents the first investigation into the capability of fiber Bragg grating (FBG sensors to measure interface pressure between the stump and the prosthetic sockets of a trans-tibial amputee. FBG element(s were recoated with and embedded in a thin layer of epoxy material to form a sensing pad, which was in turn embedded in a silicone polymer material to form a pressure sensor. The sensor was tested in real time by inserting a heavy-duty balloon into the socket and inflating it by using an air compressor. This test was conducted to examine the sensitivity and repeatability of the sensor when subjected to pressure from the stump of the trans-tibial amputee and to mimic the actual environment of the amputee’s Patellar Tendon (PT bar. The sensor exhibited a sensitivity of 127 pm/N and a maximum FSO hysteresis of around ~0.09 in real-time operation. Very good reliability was achieved when the sensor was utilized for in situ measurements. This study may lead to smart FBG-based amputee stump/socket structures for pressure monitoring in amputee socket systems, which will result in better-designed prosthetic sockets that ensure improved patient satisfaction.

  9. The measurement capabilities of cross-sectional profile of Nanoimprint template pattern using small angle x-ray scattering

    Science.gov (United States)

    Yamanaka, Eiji; Taniguchi, Rikiya; Itoh, Masamitsu; Omote, Kazuhiko; Ito, Yoshiyasu; Ogata, Kiyoshi; Hayashi, Naoya

    2016-05-01

    report, we will report the measurement capabilities of GI-SAXS technique as a cross-sectional profile measurement tool of NIL quartz template pattern.

  10. Three-dimensional metrology inside a vacuum chamber

    Science.gov (United States)

    Costille, Anne; Beaumont, Florent; Prieto, Eric; Carle, Michael; Fabron, Christophe

    2016-07-01

    Several three dimensional coordinates systems are proposed by companies to provide accurate measurement of mechanical parts in a volume. None of them are designed to perform the metrology of a system in a vacuum chamber. In the frame of the test of NISP instrument from ESA Euclid mission, the question was raised to perform a three dimensional measurement of different parts during the thermal test of NISP instrument into ERIOS chamber done at Laboratoire d'Astrophysique de Marseille (LAM). One of the main objectives of the test campaign will be the measurement of the focus position of NISP image plane with respect to the EUCLID object plane to ensure a good focalisation of NISP instrument after integration on the payload. A Metrology Verification System (MVS) has been proposed. Its goal is to provide at operational temperature the measurement of references frames set on a EUCLID telescope simulator and NISP, the knowledge of the coordinates of the object point source provided by the telescope simulator and the measurement of the angle between the telescope simulator optical axis and NISP optical axis. The MVS concept is based on the use of a laser tracker, outside the vacuum chamber, that measures reflectors inside the vacuum chamber through a curved window. We will present preliminary results that show the possibility to perform this type of measurements and the accuracy reached in this configuration. An analysis of the contributors to the measurement error budget of the MVS is proposed, based on the current knowledge of the MVS performance and constraints during the TB/TV tests.

  11. Wide-range length metrology by dual-imaging-unit atomic force microscope based on porous alumina.

    Science.gov (United States)

    Zhang, Dongxian; Zhang, Haijun; Lin, Xiaofeng

    2004-06-15

    A new dual-imaging-unit atomic force microscope (DIU-AFM) was developed for wide-range length metrology. In the DIU-AFM, two AFM units were combined, one as a reference unit, and the other a test one. Their probes with Z piezo elements and tips were horizontally set in parallel at the same height to reduce errors due to geometric asymmetry. An XY scanner was attached to an XY block that was able to move in the X direction with a step of about 500 nm. A standard porous alumina film was employed as the reference sample. Both reference sample and test sample were installed at the center of the XY scanner on the same surface and were simultaneously imaged. The two images had the same lateral size, and thus the length of the test sample image could be accurately measured by counting the number of periodic features of the reference one. The XY block together with the XY scanner were next moved in the X direction for about 1.5 microm and a second pair of reference and test images were obtained by activating the scanner. In this way, a series of pairs of images were acquired and could be spliced into two wide-range reference and test images, respectively. Again, the two spliced images were of the same size and the length of test image was measured based on the reference one. This article presents a discussion about the structure and control of the DIU-AFM system. Some experiments were carried out on the system to demonstrate the method of length calculation and measurement. Experiments show a satisfactory result of wide-range length metrology based on the hexagonal features of the porous alumina with a periodic length of several tens of nanometers. Using this method the DIU-AFM is capable of realizing nanometer-order accuracy length metrology when covering a wide range from micron to several hundreds of microns, or even up to millimeter order.

  12. Quantum Metrology in Non-Markovian Environments

    CERN Document Server

    Chin, Alex W; Plenio, Martin B

    2011-01-01

    We analyze optimal bounds for precision spectroscopy in the presence of general, non-Markovian phase noise. We demonstrate that the metrological equivalence of product and maximally entangled states that holds under Markovian dephasing fails in the non-Markovian case. Using an exactly solvable model of a physically realistic finite band-width dephasing environment, we show that the ensuing non-Markovian dynamics enables quantum correlated states to outperform metrological strategies based on uncorrelated states but otherwise identical resources. We show that this conclusion is a direct result of the coherent dynamics of the global state of the system and environment and, as a result, possesses general validity that goes beyond specific models.

  13. Machine tool metrology an industrial handbook

    CERN Document Server

    Smith, Graham T

    2016-01-01

    Maximizing reader insights into the key scientific disciplines of Machine Tool Metrology, this text will prove useful for the industrial-practitioner and those interested in the operation of machine tools. Within this current level of industrial-content, this book incorporates significant usage of the existing published literature and valid information obtained from a wide-spectrum of manufacturers of plant, equipment and instrumentation before putting forward novel ideas and methodologies. Providing easy to understand bullet points and lucid descriptions of metrological and calibration subjects, this book aids reader understanding of the topics discussed whilst adding a voluminous-amount of footnotes utilised throughout all of the chapters, which adds some additional detail to the subject. Featuring an extensive amount of photographic-support, this book will serve as a key reference text for all those involved in the field. .

  14. Compressed quantum metrology for the Ising Hamiltonian

    Science.gov (United States)

    Boyajian, W. L.; Skotiniotis, M.; Dür, W.; Kraus, B.

    2016-12-01

    We show how quantum metrology protocols that seek to estimate the parameters of a Hamiltonian that exhibits a quantum phase transition can be efficiently simulated on an exponentially smaller quantum computer. Specifically, by exploiting the fact that the ground state of such a Hamiltonian changes drastically around its phase-transition point, we construct a suitable observable from which one can estimate the relevant parameters of the Hamiltonian with Heisenberg scaling precision. We then show how, for the one-dimensional Ising Hamiltonian with transverse magnetic field acting on N spins, such a metrology protocol can be efficiently simulated on an exponentially smaller quantum computer while maintaining the same Heisenberg scaling for the squared error, i.e., O (N-2) precision, and derive the explicit circuit that accomplishes the simulation.

  15. Quantum metrology and estimation of Unruh effect.

    Science.gov (United States)

    Wang, Jieci; Tian, Zehua; Jing, Jiliang; Fan, Heng

    2014-11-26

    We study the quantum metrology for a pair of entangled Unruh-Dewitt detectors when one of them is accelerated and coupled to a massless scalar field. Comparing with previous schemes, our model requires only local interaction and avoids the use of cavities in the probe state preparation process. We show that the probe state preparation and the interaction between the accelerated detector and the external field have significant effects on the value of quantum Fisher information, correspondingly pose variable ultimate limit of precision in the estimation of Unruh effect. We find that the precision of the estimation can be improved by a larger effective coupling strength and a longer interaction time. Alternatively, the energy gap of the detector has a range that can provide us a better precision. Thus we may adjust those parameters and attain a higher precision in the estimation. We also find that an extremely high acceleration is not required in the quantum metrology process.

  16. Recent progress in high pressure metrology in Europe

    Directory of Open Access Journals (Sweden)

    Sabuga Wladimir

    2014-01-01

    Full Text Available Five European national metrology institutes in collaboration with a university, a research institute and five industrial companies are working on a joint research project within a framework of the European Metrology Research Programme aimed at development of 1.6 GPa primary and 1.5 GPa transfer pressure standards. Two primary pressure standards were realised as pressure-measuring multipliers, each consisting of a low pressure and a high pressure (HP piston-cylinder assembly (PCA. A special design of the HP PCAs was developed in which a tungsten carbide cylinder is supported by two thermally shrunk steel sleeves and, additionally, by jacket pressure applied to the outside of the outer sleeve. Stress-strain finite element analysis (FEA was performed to predict behaviour of the multipliers and a pressure generation system. With FEA, the pressure distortion coefficient was determined, taking into account irregularities of the piston-cylinder gap. Transfer pressure standards up to 1.5 GPa are developed on the basis of modern 1.5 GPa pressure transducers. This project shall solve a discrepancy between the growing needs of the industry demanding precise traceable calibrations of the high pressure transducers and the absence of adequate primary standards for pressures higher than 1 GPa in the European Union today.

  17. Ice flood velocity calculating approach based on single view metrology

    Science.gov (United States)

    Wu, X.; Xu, L.

    2017-02-01

    Yellow River is the river in which the ice flood occurs most frequently in China, hence, the Ice flood forecasting has great significance for the river flood prevention work. In various ice flood forecast models, the flow velocity is one of the most important parameters. In spite of the great significance of the flow velocity, its acquisition heavily relies on manual observation or deriving from empirical formula. In recent years, with the high development of video surveillance technology and wireless transmission network, the Yellow River Conservancy Commission set up the ice situation monitoring system, in which live videos can be transmitted to the monitoring center through 3G mobile networks. In this paper, an approach to get the ice velocity based on single view metrology and motion tracking technique using monitoring videos as input data is proposed. First of all, River way can be approximated as a plane. On this condition, we analyze the geometry relevance between the object side and the image side. Besides, we present the principle to measure length in object side from image. Secondly, we use LK optical flow which support pyramid data to track the ice in motion. Combining the result of camera calibration and single view metrology, we propose a flow to calculate the real velocity of ice flood. At last we realize a prototype system by programming and use it to test the reliability and rationality of the whole solution.

  18. X-ray pulse wavefront metrology using speckle tracking

    Energy Technology Data Exchange (ETDEWEB)

    Berujon, Sebastien, E-mail: berujon@esrf.eu; Ziegler, Eric; Cloetens, Peter [European Synchrotron Radiation Facility, BP-220, F-38043 Grenoble (France)

    2015-05-09

    The theoretical description and experimental implementation of a speckle-tracking-based instrument which permits the characterisation of X-ray pulse wavefronts. An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology.

  19. Diffraction-based overlay metrology for double patterning technologies

    Science.gov (United States)

    Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

    2009-03-01

    The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

  20. An Areal Isotropic Spline Filter for Surface Metrology.

    Science.gov (United States)

    Zhang, Hao; Tong, Mingsi; Chu, Wei

    2015-01-01

    This paper deals with the application of the spline filter as an areal filter for surface metrology. A profile (2D) filter is often applied in orthogonal directions to yield an areal filter for a three-dimensional (3D) measurement. Unlike the Gaussian filter, the spline filter presents an anisotropic characteristic when used as an areal filter. This disadvantage hampers the wide application of spline filters for evaluation and analysis of areal surface topography. An approximation method is proposed in this paper to overcome the problem. In this method, a profile high-order spline filter serial is constructed to approximate the filtering characteristic of the Gaussian filter. Then an areal filter with isotropic characteristic is composed by implementing the profile spline filter in the orthogonal directions. It is demonstrated that the constructed areal filter has two important features for surface metrology: an isotropic amplitude characteristic and no end effects. Some examples of applying this method on simulated and practical surfaces are analyzed.

  1. X-ray pulse wavefront metrology using speckle tracking.

    Science.gov (United States)

    Berujon, Sebastien; Ziegler, Eric; Cloetens, Peter

    2015-07-01

    An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology.

  2. Vortex metrology using Fourier analysis techniques: vortex networks correlation fringes.

    Science.gov (United States)

    Angel-Toro, Luciano; Sierra-Sosa, Daniel; Tebaldi, Myrian; Bolognini, Néstor

    2012-10-20

    In this work, we introduce an alternative method of analysis in vortex metrology based on the application of the Fourier optics techniques. The first part of the procedure is conducted as is usual in vortex metrology for uniform in-plane displacement determination. On the basis of two recorded intensity speckled distributions, corresponding to two states of a diffuser coherently illuminated, we numerically generate an analytical signal from each recorded intensity pattern by using a version of the Riesz integral transform. Then, from each analytical signal, a two-dimensional pseudophase map is generated in which the vortices are located and characterized in terms of their topological charges and their core's structural properties. The second part of the procedure allows obtaining Young's interference fringes when Fourier transforming the light passing through a diffracting mask with multiple apertures at the locations of the homologous vortices. In fact, we use the Fourier transform as a mathematical operation to compute the far-field diffraction intensity pattern corresponding to the multiaperture set. Each aperture from the set is associated with a rectangular hole that coincides both in shape and size with a pixel from recorded images. We show that the fringe analysis can be conducted as in speckle photography in an extended range of displacement measurements. Effects related with speckled decorrelation are also considered. Our experimental results agree with those of speckle photography in the range in which both techniques are applicable.

  3. Metrology challenges for high-rate nanomanufacturing of polymer structures

    Science.gov (United States)

    Mead, Joey; Barry, Carol; Busnaina, Ahmed; Isaacs, Jacqueline

    2012-10-01

    The transfer of nanoscience accomplishments into commercial products is hindered by the lack of understanding of barriers to nanoscale manufacturing. We have developed a number of nanomanufacturing processes that leverage available high-rate plastics fabrication technologies. These processes include directed assembly of a variety of nanoelements, such as nanoparticles and nanotubes, which are then transferred onto a polymer substrate for the fabrication of conformal/flexible electronic materials, among other applications. These assembly processes utilize both electric fields and/or chemical functionalization. Conducting polymers and carbon nanotubes have been successfully transferred to a polymer substrate in times less than 5 minutes, which is commercially relevant and can be utilized in a continuous (reel to reel/roll to roll) process. Other processes include continuous high volume mixing of nanoelements (CNTs, etc) into polymers, multi-layer extrusion and 3D injection molding of polymer structures. These nanomanufacturing processes can be used for wide range of applications, including EMI shielding, flexible electronics, structural materials, and novel sensors (specifically for chem/bio detection). Current techniques to characterize the quality and efficacy of the processes are quite slow. Moreover, the instrumentation and metrology needs for these manufacturing processes are varied and challenging. Novel, rapid, in-line metrology to enable the commercialization of these processes is critically needed. This talk will explore the necessary measurement needs for polymer based nanomanufacturing processes for both step and continuous (reel to reel/roll to roll) processes.

  4. Interpreting Quantum Discord in Quantum Metrology

    OpenAIRE

    Girolami, Davide

    2015-01-01

    Multipartite quantum systems show properties which do not admit a classical explanation. In particular, even nonentangled states can enjoy a kind of quantum correlations called quantum discord. I discuss some recent results on the role of quantum discord in metrology. Given an interferometric phase estimation protocol where the Hamiltonian is initially unknown to the experimentalist, the quantum discord of the probe state quantifies the minimum precision of the estimation. This provides a phy...

  5. Geometrical metrology on vacuum cast silicone rubber form using computed tomography

    DEFF Research Database (Denmark)

    Pacurar, Ramona; Müller, Pavel; De Chiffre, Leonardo

    An investigation on geometrical measurements of silicone rubber cake form and polyamide molds using three measuring techniques - CMM, optical scanner and CT scanner - was carried out. The only measurand was diameter of a cone measured at specified levels. An uncertainty budget for all three techn...... and measuring of complicated features. In connection with the silicone rubber form, CT scanning could be also used for example for failure analysis, 3D volume analysis and other non-destructive and metrological analysis....

  6. Neutron metrology in the HFR

    Energy Technology Data Exchange (ETDEWEB)

    Voorbraak, W.P.; Freudenreich, W.E.; Paardekooper, A.; Stecher-Rasmussen, F.; Verhagen, H.W.

    1991-11-01

    Results are presented of the ECN measurements at the filtered HFR beam HB11. The neutron measurements took place in the free beam at full power. Several gamma measurements were performed at full power under different conditions. The neutron spectrum was obtained by adjusting a calculated spectrum with experimental results from activation foils. The gamma data were obtained with thermoluminescent dosimeters. (author). 5 refs.; 4 figs.; 4 tabs.

  7. A search algorithm for quantum state engineering and metrology

    Science.gov (United States)

    Knott, P. A.

    2016-07-01

    In this paper we present a search algorithm that finds useful optical quantum states which can be created with current technology. We apply the algorithm to the field of quantum metrology with the goal of finding states that can measure a phase shift to a high precision. Our algorithm efficiently produces a number of novel solutions: we find experimentally ready schemes to produce states that show significant improvements over the state-of-the-art, and can measure with a precision that beats the shot noise limit by over a factor of 4. Furthermore, these states demonstrate a robustness to moderate/high photon losses, and we present a conceptually simple measurement scheme that saturates the Cramér-Rao bound.

  8. 7th International Workshop on Advanced Optical Imaging and Metrology

    CERN Document Server

    2014-01-01

    In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imagi...

  9. Concept for Inclusion of Analytical and Computational Capability in Optical Plume Anomaly Detection (OPAD) for Measurement of Neutron Flux

    Science.gov (United States)

    Patrick, Marshall Clint; Cooper, Anita E.; Powers, W. T.

    2004-01-01

    Researchers are working on many fronts to make possible high-speed, automated classification and quantification of constituent materials in numerous environments. NASA's Marshall Space Flight Center has implemented a system for rocket engine flowfields/plumes. The Optical Plume Anomaly Detector (OPAD) system was designed to utilize emission and absorption spectroscopy for monitoring molecular and atomic particulates in gas plasma. An accompanying suite of tools and analytical package designed to utilize information collected by OPAD is known as the Engine Diagnostic Filtering System (EDiFiS). The current combination of these systems identifies atomic and molecular species and quantifies mass loss rates in H2/O2 rocket plumes. Capabilities for real-time processing are being advanced on several fronts, including an effort to hardware encode components of the EDiFiS for health monitoring and management. This paper addresses the OPAD with its tool suites, and discusses what is considered a natural progression: a concept for taking OPAD to the next logical level of high energy physics, incorporating fermion and boson particle analyses in measurement of neutron flux.

  10. An Improved Polar-Coordinate Navigation System with the Establishment of Electronic Counter-counter Measures Capabilities

    Directory of Open Access Journals (Sweden)

    Qiang Zhang

    2013-01-01

    Full Text Available With easy-to-be-disposed architecture and premium navigation performances, polar-coordinate navigationsystem (PCNS is still widely utilized by modern military navigation systems. Unfortunately, PCNS has very poor electronic counter-counter measures (ECCM performances, due to the lack of electronic warfare (EW considerations during its initial system design. To solve this problem, an improved PCNS (Imp-PCNS is proposed in this paper to introduce ECCM capabilities to PCNS. The low probability of intercept (LPI waveforms are utilized instead of regular pulses to reduce the probability of hostile interception. Both the bandwidth and the transmitted power of LPI are designed to generate the signals submerged under the thermal noises at the front ends of enemy receivers. Finally, a kinematic bearing method is proposed to dramatically reduce the possibility of intercept. The principle of kinematic bearing is analyzed in detail. An undistorted observed geometric position (OGP, which is independent ofthe deviation of observing angle, is achieved by controlling the rotation of the antenna array of PCNS beacon.Defence Science Journal, 2013, 63(1, pp.114-118, DOI:http://dx.doi.org/10.14429/dsj.63.2519

  11. An Improved Polar-Coordinate Navigation System with the Establishment of Electronic Counter-counter Measures Capabilities

    Directory of Open Access Journals (Sweden)

    Zhang Qiang

    2013-01-01

    Full Text Available With easy-to-be-disposed architecture and premium navigation performances, polar-coordinate navigation system (PCNS is still widely utilized by modern military navigation systems. Unfortunately, PCNS has very poor electronic counter-counter measures (ECCM performances, due to the lack of electronic warfare (EW considerations during its initial system design. To solve this problem, an improved PCNS (Imp-PCNS is proposed in this paper to introduce ECCM capabilities to PCNS. The low probability of intercept (LPI waveforms are utilized instead of regular pulses to reduce the probability of hostile interception. Both the bandwidth and the transmitted power of LPI are designed to generate the signals submerged under the thermal noises at the front ends of enemy receivers. Finally, a kinematic bearing method is proposed to dramatically reduce the possibility of intercept. The principle of kinematic bearing is analyzed in detail. An undistorted observed geometric position (OGP, which is independent of the deviation of observing angle, is achieved by controlling the rotation of the antenna array of PCNS beacon.

  12. Emerging trends in surface metrology

    DEFF Research Database (Denmark)

    Lonardo, P.M.; Lucca, D.A.; De Chiffre, Leonardo

    2002-01-01

    Recent advancements and some emerging trends in the methods and instruments used for surface and near surface characterisation are presented, considering the measurement of both topography and physical properties. In particular, surfaces that present difficulties in measurement or require new pro...

  13. Deep sub-wavelength metrology for advanced defect classification

    Science.gov (United States)

    van der Walle, P.; Kramer, E.; van der Donck, J. C. J.; Mulckhuyse, W.; Nijsten, L.; Bernal Arango, F. A.; de Jong, A.; van Zeijl, E.; Spruit, H. E. T.; van den Berg, J. H.; Nanda, G.; van Langen-Suurling, A. K.; Alkemade, P. F. A.; Pereira, S. F.; Maas, D. J.

    2017-06-01

    Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification. For defect detection, TNO has developed the Rapid Nano (RN3) particle scanner, which illuminates the sample from nine azimuth angles. The RN3 is capable of detecting 42 nm Latex Sphere Equivalent (LSE) particles on XXX-flat Silicon wafers. For each sample, the lower detection limit (LDL) can be verified by an analysis of the speckle signal, which originates from the surface roughness of the substrate. In detection-mode (RN3.1), the signal from all illumination angles is added. In review-mode (RN3.9), the signals from all nine arms are recorded individually and analyzed in order to retrieve additional information on the shape and size of deep sub-wavelength defects. This paper presents experimental and modelling results on the extraction of shape information from the RN3.9 multi-azimuth signal such as aspect ratio, skewness, and orientation of test defects. Both modeling and experimental work confirm that the RN3.9 signal contains detailed defect shape information. After review by RN3.9, defects are coarsely classified, yielding a purified Defect-of-Interest (DoI) list for further analysis on slower metrology tools, such as SEM, AFM or HIM, that provide more detailed review data and further classification. Purifying the DoI list via optical metrology with RN3.9 will make inspection time on slower review tools more efficient.

  14. A Toolbox of Metrology-Based Techniques for Optical System Alignment

    Science.gov (United States)

    Coulter, Phillip; Ohl, Raymond G.; Blake, Peter N.; Bos, Brent J.; Eichhorn, William L.; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hagopian, John G.; Hayden, Joseph E.; Hetherington, Samuel E.; Kubalak, David A.; McLean, Kyle F.; McMann, Joseph; Redman, Kevin W.; Sampler, Henry P.; Wenzel, Greg W.; Young, Jerrod L.

    2016-01-01

    The NASA Goddard Space Flight Center (GSFC) and its partners have broad experience in the alignment of flight optical instruments and spacecraft structures. Over decades, GSFC developed alignment capabilities and techniques for a variety of optical and aerospace applications. In this paper, we provide an overview of a subset of the capabilities and techniques used on several recent projects in a "toolbox" format. We discuss a range of applications, from small-scale optical alignment of sensors to mirror and bench examples that make use of various large-volume metrology techniques. We also discuss instruments and analytical tools.

  15. A toolbox of metrology-based techniques for optical system alignment

    Science.gov (United States)

    Coulter, Phillip; Ohl, Raymond G.; Blake, Peter N.; Bos, Brent J.; Chambers, Victor J.; Eichhorn, William L.; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hagopian, John G.; Hayden, Joseph E.; Hetherington, Samuel E.; Kubalak, David A.; Mclean, Kyle F.; McMann, Joseph C.; Redman, Kevin W.; Sampler, Henry P.; Wenzel, Greg W.; Young, Jerrod L.

    2016-10-01

    The NASA Goddard Space Flight Center (GSFC) and its partners have broad experience in the alignment of flight optical instruments and spacecraft structures. Over decades, GSFC developed alignment capabilities and techniques for a variety of optical and aerospace applications. In this paper, we provide an overview of a subset of the capabilities and techniques used on several recent projects in a "toolbox" format. We discuss a range of applications, from small-scale optical alignment of sensors to mirror and bench examples that make use of various large-volume metrology techniques. We also discuss instruments and analytical tools.

  16. Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology

    Science.gov (United States)

    Helfenstein, Patrick; Mohacsi, Istvan; Rajeev, Rajendran; Ekinci, Yasin

    2016-07-01

    For the successful implementation of extreme ultraviolet (EUV) lithography in the upcoming technology nodes, a major challenge to overcome is the stable and reliable detection and characterization of mask defects. We have recently presented a reflective mode EUV mask scanning lensless imaging tool (RESCAN) which was installed at the XIL-II beamline of the swiss light source and showed reconstructed aerial images of test patterns on EUV masks. RESCAN uses scanning coherent diffractive imaging (SCDI) methods to obtain actinic aerial images of EUV photomasks and was designed for 80 nm onmask resolution. Our SCDI algorithm reconstructs the measured sample by iteratively solving the phase problem using overdetermined diffraction data gathered by scanning across the specimen with a finite illumination. It provides the phase and amplitude aerial images of EUV photomasks with high resolution without the need to use high numerical aperture (NA) lenses. Contrary to scanning microscopy and full-field microscopy, where the resolution is limited by the spot size or NA of the lens, the achievable resolution with our method depends on the detector noise and NA of the detector. To increase the resolution of our tool, we upgraded RESCAN with a detector and algorithms. Here, we present the results obtained with the tool that is capable of up to 40-nm onmask resolution. We believe that the realization of our prototype marks a significant step toward overcoming the limitations imposed by methods relying on imaging optics and shows a viable solution for actinic mask metrology.

  17. Metrology calibration and very high accuracy centroiding with the NEAT testbed

    CERN Document Server

    Crouzier, A; Preis, O; Henault, F; Kern, P; Martin, G; Feautrier, P; Stadler, E; Lafrasse, S; Delboulbe, A; Behar, E; Saint-Pe, M; Dupont, J; Potin, S; Cara, C; Donati, M; Doumayrou, E; Lagage, P O; Léger, A; LeDuigou, J M; Shao, M; Goullioud, R

    2014-01-01

    NEAT is an astrometric mission proposed to ESA with the objectives of detecting Earth-like exoplanets in the habitable zone of nearby solar-type stars. NEAT requires the capability to measure stellar centroids at the precision of 5e-6 pixel. Current state-of-the-art methods for centroid estimation have reached a precision of about 2e-5 pixel at two times Nyquist sampling, this was shown at the JPL by the VESTA experiment. A metrology system was used to calibrate intra and inter pixel quantum efficiency variations in order to correct pixelation errors. The European part of the NEAT consortium is building a testbed in vacuum in order to achieve 5e-6 pixel precision for the centroid estimation. The goal is to provide a proof of concept for the precision requirement of the NEAT spacecraft. The testbed consists of two main sub-systems. The first one produces pseudo stars: a blackbody source is fed into a large core fiber and lights-up a pinhole mask in the object plane, which is imaged by a mirror on the CCD. The ...

  18. Capability ethics

    NARCIS (Netherlands)

    I.A.M. Robeyns (Ingrid)

    2012-01-01

    textabstractThe capability approach is one of the most recent additions to the landscape of normative theories in ethics and political philosophy. Yet in its present stage of development, the capability approach is not a full-blown normative theory, in contrast to utilitarianism, deontological

  19. Capability ethics

    NARCIS (Netherlands)

    I.A.M. Robeyns (Ingrid)

    2012-01-01

    textabstractThe capability approach is one of the most recent additions to the landscape of normative theories in ethics and political philosophy. Yet in its present stage of development, the capability approach is not a full-blown normative theory, in contrast to utilitarianism, deontological theor

  20. Capability ethics

    NARCIS (Netherlands)

    I.A.M. Robeyns (Ingrid)

    2012-01-01

    textabstractThe capability approach is one of the most recent additions to the landscape of normative theories in ethics and political philosophy. Yet in its present stage of development, the capability approach is not a full-blown normative theory, in contrast to utilitarianism, deontological theor