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Sample records for masked uv laser

  1. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    KAUST Repository

    Fan, Yiqiang

    2013-12-16

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.

  2. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    KAUST Repository

    Fan, Yiqiang; Li, Huawei; Yi, Ying; Foulds, Ian G.

    2013-01-01

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax

  3. Patterning of nanoparticulate transparent conductive ITO films using UV light irradiation and UV laser beam writing

    International Nuclear Information System (INIS)

    Solieman, A.; Moharram, A.H.; Aegerter, M.A.

    2010-01-01

    Indium tin oxide (ITO) thin film is one of the most widely used as transparent conductive electrodes in all forms of flat panel display (FPD) and microelectronic devices. Suspension of already crystalline conductive ITO nanoparticles fully dispersed in alcohol was spun, after modifying with coupling agent, on glass substrates. The low cost, simple and versatile traditional photolithography process without complication of the photoresist layer was used for patterning ITO films. Using of UV light irradiation through mask and direct UV laser beam writing resulted in an accurate linear, sharp edge and very smooth patterns. Irradiated ITO film showed a high transparency (∼85%) in the visible region. The electrical sheet resistance decrease with increasing time of exposure to UV light and UV laser. Only 5 min UV light irradiation is enough to decrease the electrical sheet resistance down to 5 kΩ□.

  4. Micropatterning on cylindrical surfaces via electrochemical etching using laser masking

    International Nuclear Information System (INIS)

    Cho, Chull Hee; Shin, Hong Shik; Chu, Chong Nam

    2014-01-01

    Highlights: • Various micropatterns were fabricated on the cylindrical surface of a stainless steel shaft. • Selective electrochemical dissolution was achieved via a series process of laser masking and electrochemical etching. • Laser masking characteristics on the non-planar surface were investigated. • A uniform mask layer was formed on the cylindrical surface via synchronized laser line scanning with a rotary system. • The characteristics of electrochemical etching on the non-planar surface were investigated. - Abstract: This paper proposes a method of selective electrochemical dissolution on the cylindrical surfaces of stainless steel shafts. Selective electrochemical dissolution was achieved via electrochemical etching using laser masking. A micropatterned recast layer was formed on the surface via ytterbium-doped pulsed fiber laser irradiation. The micropatterned recast layer could be used as a mask layer during the electrochemical etching process. Laser masking condition to form adequate mask layer on the planar surface for etching cannot be used directly on the non-planar surface. Laser masking condition changes depending on the morphological surface. The laser masking characteristics were investigated in order to form a uniform mask layer on the cylindrical surface. To minimize factors causing non-uniformity in the mask layer on the cylindrical surface, synchronized laser line scanning with a rotary system was applied during the laser masking process. Electrochemical etching characteristics were also investigated to achieve deeper etched depth, without collapsing the recast layer. Consequently, through a series process of laser masking and electrochemical etching, various micropatternings were successfully performed on the cylindrical surfaces

  5. Imaging micro-well proportional counters fabricated with masked UV laser ablation

    CERN Document Server

    Deines-Jones, P; Crawford, H; Hunter, S D

    2002-01-01

    The micro-well detector is a gas-proportional counter similar to the CAT (Bartol et al., J. Phys. III 6 (1996) 337) and WELL detectors (Bellazzini et al., Nucl. Instr. and Meth. A 423 (1999) 125). The micro-well is a cylindrical hole formed in the polymer substrate of commercially fabricated copper-clad flexible printed circuit board by UV laser ablation. The micro-wells are drilled at GSFC's UV laser-ablation facility. The cathode is a metal annulus that surrounds the opening of the well. The anode is a metal pad that fills the bottom of the well. Advantages of this topology include intrinsic two-dimensional sensing, thick robust electrodes, and large localized image charge on the cathodes. We have fabricated 5 cmx5 cm micro-well detectors with segmented anodes (1-d) and with both anodes and cathodes segmented (2-d), and have demonstrated: - stable, proportional operation at gas gains in excess of 30,000 in Ar- and Xe-based gases; - FWHM energy resolution of 20% at 6 keV in P-10; - preliminary 1-d spatial re...

  6. uv dye lasers

    International Nuclear Information System (INIS)

    Abakumov, G.A.; Fadeev, V.V.; Khokhlov, R.V.; Simonov, A.P.

    1975-01-01

    The most important property of visible dye lasers, that is, continuous wavelength tuning, stimulated the search for dyes capable to lase in uv. They were found in 1968. Now the need for tunable uv lasers for applications in spectroscopy, photochemistry, isotope separation, remote air and sea probing, etc. is clearly seen. A review of some recent advances in uv dye lasers is reviewed

  7. Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

    International Nuclear Information System (INIS)

    Ihlemann, J.; Bekesi, J.; Klein-Wiele, J.H.; Simon, P.

    2008-01-01

    Micro processing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO2, Al2O3, HfO2, and Ta2O5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO2 are produced by patterning a UV-absorbing precursor SiOx suboxide layer and oxidizing it afterwards to SiO2. In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.

  8. Energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1996-01-01

    A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may...... be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%....

  9. Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

    KAUST Repository

    Fan, Yiqiang; Liu, Yang; Li, Huawei; Foulds, Ian G.

    2012-01-01

    This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct

  10. High Efficiency Mask Based Laser Materials Processing with TEA-CO2 - and Excimer Laser

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general, mask based laser materials processing techniques suffer from a very low energy efficiency. We have developed a simple device called an energy enhancer, which is capable of increasing the energy efficiency of typical mask based laser materials processing systems. A short review of the ...... line marking with TEA-CO2 laser of high speed canning lines. The second one is manufactured for marking or microdrilling with excimer laser....

  11. Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

    International Nuclear Information System (INIS)

    Fan, Yiqiang; Liu, Yang; Li, Huawei; Foulds, Ian G

    2012-01-01

    This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct printing of the mask onto a polymer sheet using a commercial wax printer. The wax layer was then transferred to a PMMA substrate using a thermal laminator, exposed using deep-UV (with a wavelength of 254 nm), developed in an IPA:water solution, and completed by bonding on a PMMA cap layer. A sample microfluidic device fabricated with this method is also presented, with the microchannel as narrow as 50 µm. The whole process is easy to perform without the requirement for any microfabrication facilities. (technical note)

  12. Hydrodynamic simulation of X-UV laser-produced plasmas

    International Nuclear Information System (INIS)

    Fajardo, M.; Zeitoun, P.; Gauthier, J.C.

    2004-01-01

    With the construction of novel X-UV sources, such as V-UV FEL's (free-electron lasers), X-UV laser-matter interaction will become available at ultra-high intensities. But even table-top facilities such as X-UV lasers or High Harmonic Generation, are starting to reach intensities high enough to produce dense plasmas. X-UV laser-matter interaction is studied by a 1-dimensional hydrodynamic Lagrangian code with radiative transfer for a range of interesting X-UV sources. Heating is found to be very different for Z=12-14 elements having L-edges around the X-UV laser wavelength. Possible absorption mechanisms were investigated in order to explain this behaviour, and interaction with cold dense matter proved to be dominant. Plasma sensitivity to X-UV laser parameters such as energy, pulse duration, and wavelength was also studied, covering ranges of existing X-UV lasers. We found that X-UV laser-produced plasmas could be studied using table-top lasers, paving the way for future V-UV-FEL high intensity experiments. (authors)

  13. A phase mask fiber grating and sensing applications

    Directory of Open Access Journals (Sweden)

    Preecha P. Yupapin

    2003-09-01

    Full Text Available This paper presents an investigation of a fabricated fiber grating device characteristics and its applications, using a phase mask writing technique. The use of a most common UV phase laser (KrF eximer laser, with high intensity light source was focussed to the phase mask for writing on a fiber optic sample. The device (i.e. grating characteristic especially, in sensing application, was investigated. The possibility of using such device for temperature and strain sensors is discussed.

  14. Multiple-height microstructure fabricated by deep reactive ion etching and soft resist masks combined with UV curing

    International Nuclear Information System (INIS)

    Sato, R; Sawada, T; Kumagai, S; Sasaki, M

    2014-01-01

    Multiple-height microstructures are realized by deep reactive ion etching and UV-cured photoresist used in the embedded mask process. Although the UV-cured photoresist is a soft mask, its material property becomes stable against resist thinner and UV exposure. A layered resist pattern can be realized by stacking normal photoresist on the UV-cured photoresist. The normal photoresist can be selectively removed by the flush exposure and developing after the first Si etching. This technique is applied to two MEMS devices

  15. Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

    KAUST Repository

    Fan, Yiqiang

    2012-01-13

    This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct printing of the mask onto a polymer sheet using a commercial wax printer. The wax layer was then transferred to a PMMA substrate using a thermal laminator, exposed using deep-UV (with a wavelength of 254 nm), developed in an IPA:water solution, and completed by bonding on a PMMA cap layer. A sample microfluidic device fabricated with this method is also presented, with the microchannel as narrow as 50 μm. The whole process is easy to perform without the requirement for any microfabrication facilities. © 2012 IOP Publishing Ltd.

  16. LASER PROCESSING ON SINGLE CRYSTALS BY UV PULSE LASER

    OpenAIRE

    龍見, 雅美; 佐々木, 徹; 高山, 恭宜

    2009-01-01

    Laser processing by using UV pulsed laser was carried out on single crystal such as sapphire and diamond in order to understand the fundamental laser processing on single crystal. The absorption edges of diamond and sapphire are longer and shorter than the wave length of UV laser, respectively. The processed regions by laser with near threshold power of processing show quite different state in each crystal.

  17. X-UV lasers and their promising applications

    International Nuclear Information System (INIS)

    Ros, D.

    2004-01-01

    The author reviews 30 years of research and achievements concerning X-UV lasers. Typical features of X-UV lasers are: a large number of photons emitted per impulse (between 10 12 and 10 14 ) and very short impulses (between 1 and 100 ps). When a crystal is irradiated by a X-UV laser, these features favor new physical processes that did not appear when the irradiation was performed with other X-UV sources like synchrotron radiation for instance. Their high brilliance and coherence properties make them efficient means as irradiating sources or imaging tools. X-UV laser interferometry allows the mapping of a surface at the nano-metric scale without any interaction between the laser beam and the surface. (A.C.)

  18. UV laser drilling of SiC for semiconductor device fabrication

    Energy Technology Data Exchange (ETDEWEB)

    Krueger, Olaf; Schoene, Gerd; Wernicke, Tim; John, Wilfred; Wuerfl, Joachim; Traenkle, Guenther [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany)

    2007-04-15

    Pulsed UV laser processing is used to drill micro holes in silicon carbide (SiC) wafers supporting AlGaN/GaN transistor structures. Direct laser ablation using nanosecond pulses has been proven to provide an efficient way to create through and blind holes in 400 {mu}m thick SiC. When drilling through, openings in the front pads are formed, while blind holes stop {approx}40 {mu}m before the backside and were advanced to the electrical contact pad by subsequent plasma etching without an additional mask. Low induction connections (vias) between the transistor's source pads and the ground on the backside were formed by metallization of the holes. Micro vias having aspect ratios of 5-6 have been processed in 400 {mu}m SiC. The process flow from wafer layout to laser drilling is available including an automated beam alignment that allows a positioning accuracy of {+-}1 {mu}m with respect to existing patterns on the wafer. As proven by electrical dc and rf measurements the laser-assisted via technologies have successfully been implemented into fabrication of AlGaN/GaN high-power transistors.

  19. Effect of UV laser irradiation on tissue

    International Nuclear Information System (INIS)

    Nakayama, Takeyoshi; Kubo, Uichi

    1992-01-01

    Laser-tissue interactions have been investigated through Electron Probe Micro Analysis (EPMA), UV-visible optical absorption and Fourier Transform Infrared Spectroscopy (FTIR). Three excimer lasers, ArF, KrF and XeCl, were used to irradiate tissue; cow thighbone and gelatin thin film. Features of UV laser irradiation are described. (author)

  20. Capillary electrophoresis hyphenated with UV-native-laser induced fluorescence detection (CE/UV-native-LIF).

    Science.gov (United States)

    Couderc, François; Ong-Meang, Varravaddheay; Poinsot, Véréna

    2017-01-01

    Native laser-induced fluorescence using UV lasers associated to CE offers now a large related literature, for now 30 years. The main works have been performed using very expensive Ar-ion lasers emitting at 257 and 275 nm. They are not affordable for routine analyses, but have numerous applications such as protein, catecholamine, and indolamine analysis. Some other lasers such as HeCd 325 nm have been used but only for few applications. Diode lasers, emitting at 266 nm, cheaper, are extensively used for the same topics, even if the obtained sensitivity is lower than the one observed using the costly UV-Ar-ion lasers. This review presents various CE or microchips applications and different UV lasers used for the excitation of native fluorescence. We showed that CE/Native UV laser induced fluorescence detection is very sensitive for detection as well as small aromatic biomolecules than proteins containing Trp and Tyr amino acids. Moreover, it is a simple way to analyze biomolecules without derivatization. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  1. Uv laser triggering of high-voltage gas switches

    International Nuclear Information System (INIS)

    Woodworth, J.R.; Frost, C.A.; Green, T.A.

    1982-01-01

    Two different techniques are discussed for uv laser triggering of high-voltage gas switches using a KrF laser (248 nm) to create an ionized channel through the dielectric gas in a spark gap. One technique uses an uv laser to induce breakdown in SF 6 . For this technique, we present data that demonstrate a 1-sigma jitter of +- 150 ps for a 0.5-MV switch at 80% of its self-breakdown voltage using a low-divergence KrF laser. The other scheme uses additives to the normal dielectric gas, such as tripropylamine, which are selected to undergo resonant two-step ionization in the uv laser field

  2. Prototype of an energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general mask based laser material processing (MBLMP) is a process which suffers from a low energy efficiency, because the majority of the laser light is absorbed in or reflected by the mask. We have developed a device called an energy enhancer which is capable of improving the energy efficienc...... component reflectivity and alignment sensitivity are investigated in order to evaluate the possibility of making commercial use of the device. The obtainable image quality and how this is influenced by the focusing and imaging system is discussed in some detail....... by a factor of 2 - 4 for a typical TEA-CO2 system for mask based laser marking. A simple ray-tracing model has been built in order to design and optimise the energy enhancer. Thus we present experimental results as well as simulations and show fine accordance between the two. Important system parameters like...

  3. Optical system for UV-laser technological equipment

    Science.gov (United States)

    Fedosov, Yuri V.; Romanova, Galina E.; Afanasev, Maxim Ya.

    2017-09-01

    Recently there has been an intensive development of intelligent industrial equipment that is highly automated and can be rapidly adjusted for certain details. This equipment can be robotics systems, automatic wrappers and markers, CNC machines and 3D printers. The work equipment considered is the system for selective curing of photopolymers using a UV-laser and UV-radiation in such equipment that leads to additional technical difficulties. In many cases for transporting the radiation from the laser to the point processed, a multi-mirror system is used: however, such systems are usually difficult to adjust. Additionally, such multi-mirror systems are usually used as a part of the equipment for laser cutting of metals using high-power IR-lasers. For the UV-lasers, using many mirrors leads to crucial radiation losses because of many reflections. Therefore, during the development of the optical system for technological equipment using UV-laser we need to solve two main problems: to transfer the radiation for the working point with minimum losses and to include the system for controlling/handling the radiation spot position. We introduce a system for working with UV-lasers with 450mW of power and a wavelength of 0.45 μm based on a fiber system. In our modelling and design, we achieve spot sizes of about 300 μm, and the designed optical and mechanical systems (prototypes) were manufactured and assembled. In this paper, we present the layout of the technological unit, the results of the theoretical modelling of some parts of the system and some experimental results.

  4. UV laser-induced cross-linking in peptides

    Science.gov (United States)

    Leo, Gabriella; Altucci, Carlo; Bourgoin-Voillard, Sandrine; Gravagnuolo, Alfredo M.; Esposito, Rosario; Marino, Gennaro; Costello, Catherine E.; Velotta, Raffaele; Birolo, Leila

    2013-01-01

    RATIONALE The aim of this study was to demonstrate, and to characterize by high resolution mass spectrometry, that it is possible to preferentially induce covalent cross-links in peptides by using high energy femtosecond UV laser pulses. The cross-link is readily formed only when aromatic amino acids are present in the peptide sequence. METHODS Three peptides, xenopsin, angiotensin I, interleukin, individually or in combination, were exposed to high energy femtosecond UV laser pulses, either alone or in the presence of spin trapping molecules, the reaction products being characterized by high resolution mass spectrometry. RESULTS High resolution mass spectrometry and spin trapping strategies showed that cross-linking occurs readily, proceeds via a radical mechanism, and is the highly dominant reaction, proceeding without causing significant photo-damage in the investigated range of experimental parameters. CONCLUSIONS High energy femtosecond UV laser pulses can be used to induce covalent cross-links between aromatic amino acids in peptides, overcoming photo-oxidation processes, that predominate as the mean laser pulse intensity approaches illumination conditions achievable with conventional UV light sources. PMID:23754800

  5. Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

    DEFF Research Database (Denmark)

    Berini, Abadal Gabriel; Boisen, Anja; Davis, Zachary James

    1999-01-01

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromecha......A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production...... writing, and to perform submicron modifications by AFM oxidation. The mask fabrication for a nanoscale suspended resonator bridge is used to illustrate the advantages of this combined technique for NEMS. (C) 1999 American Institute of Physics. [S0003-6951(99)00221-1]....

  6. Laser etching of polymer masked leadframes

    Science.gov (United States)

    Ho, C. K.; Man, H. C.; Yue, T. M.; Yuen, C. W.

    1997-02-01

    A typical electroplating production line for the deposition of silver pattern on copper leadframes in the semiconductor industry involves twenty to twenty five steps of cleaning, pickling, plating, stripping etc. This complex production process occupies large floor space and has also a number of problems such as difficulty in the production of rubber masks and alignment, generation of toxic fumes, high cost of water consumption and sometimes uncertainty on the cleanliness of the surfaces to be plated. A novel laser patterning process is proposed in this paper which can replace many steps in the existing electroplating line. The proposed process involves the application of high speed laser etching techniques on leadframes which were protected with polymer coating. The desired pattern for silver electroplating is produced by laser ablation of the polymer coating. Excimer laser was found to be most effective for this process as it can expose a pattern of clean copper substrate which can be silver plated successfully. Previous working of Nd:YAG laser ablation showed that 1.06 μm radiation was not suitable for this etching process because a thin organic and transparent film remained on the laser etched region. The effect of excimer pulse frequency and energy density upon the removal rate of the polymer coating was studied.

  7. Mitigation and control of the overcuring effect in mask projection micro-stereolithography

    OpenAIRE

    O'Neill, Paul; Kent, Nigel J.; Brabazon, Dermot

    2017-01-01

    Mask Projection micro-Stereolithography (MPμSL) is an additive manufacturing technique capable of producing solid parts with micron-scale resolution from a vat of photocurable liquid polymer resin. Although the physical mechanism remains the same, the process differs from traditional laser-galvanometer based stereolithography (SL) in its use of a dynamic mask UV projector, or digital light processor (DLP), which cures each location within each 3D layer at the same time. One area where MPµSL h...

  8. UV Resonant Raman Spectrometer with Multi-Line Laser Excitation

    Science.gov (United States)

    Lambert, James L.; Kohel, James M.; Kirby, James P.; Morookian, John Michael; Pelletier, Michael J.

    2013-01-01

    A Raman spectrometer employs two or more UV (ultraviolet) laser wavel engths to generate UV resonant Raman (UVRR) spectra in organic sampl es. Resonant Raman scattering results when the laser excitation is n ear an electronic transition of a molecule, and the enhancement of R aman signals can be several orders of magnitude. In addition, the Ra man cross-section is inversely proportional to the fourth power of t he wavelength, so the UV Raman emission is increased by another fact or of 16, or greater, over visible Raman emissions. The Raman-scatter ed light is collected using a high-resolution broadband spectrograph . Further suppression of the Rayleigh-scattered laser light is provi ded by custom UV notch filters.

  9. Fabrication of rectangular cross-sectional microchannels on PMMA with a CO2 laser and underwater fabricated copper mask

    Science.gov (United States)

    Prakash, Shashi; Kumar, Subrata

    2017-09-01

    CO2 lasers are commonly used for fabricating polymer based microfluidic devices. Despite several key advantages like low cost, time effectiveness, easy to operate and no requirement of clean room facility, CO2 lasers suffer from few disadvantages like thermal bulging, improper dimensional control, difficulty to produce microchannels of other than Gaussian cross sectional shapes and inclined surface walls. Many microfluidic devices require square or rectangular cross-sections which are difficult to produce using normal CO2 laser procedures. In this work, a thin copper sheet of 40 μm was used as a mask above the PMMA (Polymethyl-methacrylate) substrate while fabricating the microchannels utilizing the raster scanning feature of the CO2 lasers. Microchannels with different width dimensions were fabricated utilizing a CO2 laser in with mask and without-mask conditions. A comparison of both the fabricating process has been made. It was found that microchannels with U shape cross section and rectangular cross-section can efficiently be produced using the with mask technique. In addition to this, this technique can provide perfect dimensional control and better surface quality of the microchannel walls. Such a microchannel fabrication process do not require any post-processing. The fabrication of mask using a nanosecond fiber laser has been discussed in details. An underwater laser fabrication method was adopted to overcome heat related defects in mask preparation. Overall, the technique was found to be easy to adopt and significant improvements were observed in microchannel fabrication.

  10. Photodeposited diffractive optical elements of computer generated masks

    International Nuclear Information System (INIS)

    Mirchin, N.; Peled, A.; Baal-Zedaka, I.; Margolin, R.; Zagon, M.; Lapsker, I.; Verdyan, A.; Azoulay, J.

    2005-01-01

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick

  11. UV-VUV laser induced phenomena in SiO2 glass

    International Nuclear Information System (INIS)

    Kajihara, Koichi; Ikuta, Yoshiaki; Oto, Masanori; Hirano, Masahiro; Skuja, Linards; Hosono, Hideo

    2004-01-01

    Creation and annihilation of point defects were studied for SiO 2 glass exposed to ultraviolet (UV) and vacuum UV (VUV) lights to improve transparency and radiation toughness of SiO 2 glass to UV-VUV laser light. Topologically disordered structure of SiO 2 glass featured by the distribution of Si-O-Si angle is a critical factor degrading transmittance near the fundamental absorption edge. Doping with terminal functional groups enhances the structural relaxation and reduces the number of strained Si-O-Si bonds by breaking up the glass network without creating the color centers. Transmittance and laser toughness of SiO 2 glass for F 2 laser is greatly improved in fluorine-doped SiO 2 glass, often referred as 'modified silica glass'. Interstitial hydrogenous species are mobile and reactive at ambient temperature, and play an important role in photochemical reactions induced by exposure to UV-VUV laser light. They terminate the dangling-bond type color centers, while enhancing the formation of the oxygen vacancies. These findings are utilized to develop a deep-UV optical fiber transmitting ArF laser photons with low radiation damage

  12. Effects of the inclined femto laser incidence at the phase mask on FBG carving

    Science.gov (United States)

    Wang, Jian; Wu, Shengli; Zhang, Jintao; Ren, Wenyi

    2015-12-01

    The inclined incidence of the femto laser on the phase mask in fiber Bragg grating (FBG) carving has a significant effect on the quality of FBG fabrication. Based on that the infrared femto laser has highly spatial coherence and the order walk-off will happen behind the phase mask, the interferogram generated at the fiber core by the inclined femto laser beam has been analyzed using the multi-beam interference principle. The influence of beam inclination on the coherence of the 0th and ± 1st orders diffraction with different exposure distance, the visibility of interferogram and the frequency component of the transverse interferogram intensity has also been analyzed. It is meaningful for the FBG fabricating with the femto laser.

  13. UV, visible and IR laser interaction with gelatine

    International Nuclear Information System (INIS)

    Oujja, M; Rebollar, E; Abrusci, C; Amo, A Del; Catalina, F; Castillejo, M

    2007-01-01

    In this work we investigate the effects on gelatine films of nanosecond pulsed laser irradiation at different laser wavelengths from the UV to the IR at 248, 266, 355, 532 and 1064 nm. We compared gelatines differing in gel strength values (Bloom 75 and 225) and in crosslinking degree. Formation of bubbles at the wavelengths in the UV (248 and 266 nm), melting and resolidification at 355 nm, and formation of craters by ablation in the VIS and IR (532 and 1064 nm) are the observed morphological changes. On the other hand, changes of the fluorescence behaviour of the films upon UV irradiation reveal chemical modifications of photolabile chromophores

  14. Scattered UV irradiation during VISX excimer laser keratorefractive surgery.

    Science.gov (United States)

    Hope, R J; Weber, E D; Bower, K S; Pasternak, J P; Sliney, D H

    2008-04-01

    To evaluate the potential occupational health hazards associated with scattered ultraviolet (UV) radiation during photorefractive keratectomy (PRK) using the VISX Star S3 excimer laser. The Laser Vision Center, National Naval Medical Center, Bethesda, Maryland, USA. Intraoperative radiometric measurements were made with the Ophir Power/Energy Meter (LaserStar Model PD-10 with silicon detector) during PRK treatments as well as during required calibration procedures at a distance of 20.3 cm from the left cornea. These measurements were evaluated using a worst-case scenario for exposure, and then compared with the American Conference of Governmental Industrial Hygeinists (ACGIH) Threshold Value Limits (TVL) to perform a risk/hazard analysis. During the PRK procedures, the highest measured value was 248.4 nJ/pulse. During the calibration procedures, the highest measured UV scattered radiation level was 149.6 nJ/pulse. The maximum treatment time was 52 seconds. Using a worst-case scenario in which all treatments used the maximum power and time, the total energy per eye treated was 0.132 mJ/cm2 and the total UV radiation at close range (80 cm from the treated eye) was 0.0085 mJ/cm2. With a workload of 20 patients, the total occupational exposure at 80 cm to actinic UV radiation in an 8-hour period would be 0.425 mJ/cm2. The scattered actinic UV laser radiation from the VISX Star S3 excimer laser did not exceed occupational exposure limits during a busy 8-hour workday, provided that operating room personnel were at least 80 cm from the treated eye. While the use of protective eyewear is always prudent, this study demonstrates that the trace amounts of scattered laser emissions produced by this laser do not pose a serious health risk even without the use of protective eyewear.

  15. Time-resolved photoelectron imaging using a femtosecond UV laser and a VUV free-electron laser

    OpenAIRE

    Liu, S. Y.; Ogi, Yoshihiro; Fuji, Takao; Nishizawa, Kiyoshi; Horio, Takuya; Mizuno, Tomoya; Kohguchi, Hiroshi; Nagasono, Mitsuru; Togashi, Tadashi; Tono, Kensuke; Yabashi, Makina; Senba, Yasunori; Ohashi, Haruhiko; Kimura, Hiroaki; Ishikawa, Tetsuya

    2010-01-01

    A time-resolved photoelectron imaging using a femtosecond ultraviolet (UV) laser and a vacuum UV freeelectron laser is presented. Ultrafast internal conversion and intersystem crossing in pyrazine in a supersonic molecular beam were clearly observed in the time profiles of photoioinzation intensity and time-dependent photoelectron images.

  16. UV laser-induced fluorescence spectroscopy and laser Doppler flowmetry in the diagnostics of alopecia

    Science.gov (United States)

    Skomorokha, Diana P.; Pigoreva, Yulia N.; Salmin, Vladimir V.

    2016-04-01

    Development of optical biopsy methods has a great interest for medical diagnostics. In clinical and experimental studies it is very important to analyze blood circulation quickly and accurately, thereby laser Doppler flowmetry (LDF) is widely used. UV laser-induced fluorescence spectroscopy (UV LIFS) is express highly sensitive and widely-spread method with no destructive impact, high excitation selectivity and the possibility to use in highly scattering media. The goal of this work was to assess a correlation of UV laser-induced fluorescence spectroscopy and laser Doppler flowmetry parameters, and a possibility to identify or to differentiate various types of pathological changes in tissues according to their autofluorescence spectra. Three groups of patients with diffuse (symptomatic) alopecia, androgenic alopecia, and focal alopecia have been tested. Each groups consisted of not less than 20 persons. The measurements have been done in the parietal and occipital regions of the sculls. We used the original automated spectrofluorimeter to record autofluorescence spectra, and standard laser Doppler flowmeter BLF-21 (Transonic Systems, Inc., USA) to analyze the basal levels of blood circulation. Our results show that UV LIFS accurately distinguishes the zones with different types of alopecia. We found high correlation of the basal levels of blood circulation and the integrated intensity of autofluorescence in the affected tissue.

  17. Mask-free and programmable patterning of graphene by ultrafast laser direct writing

    International Nuclear Information System (INIS)

    Chen, Hao-Yan; Han, Dongdong; Tian, Ye; Shao, Ruiqiang; Wei, Shu

    2014-01-01

    Graphical abstract: - Highlights: • We present a mask-free and programmable patterning of graphene. • Ultrafast laser can homogeneously reduce graphene oxides into micropatterns. • Desired graphene micropatterns could be created on flexible substrates. • Laser exposure duration shows influence on the conductivity of reduced graphene. • The method holds promise for fabrication and integration of graphene electronics. - Abstract: Reported here is a mask-free and programmable patterning of graphene by using femtosecond laser direct writing on graphene oxide (GO) films. Take advantage of the ultrahigh instantaneous intensity of the femtosecond laser pulse, and especially its nonlinear interactions with materials, the GO could be efficiently reduced under atmospheric condition at room temperature. Moreover, the designability of femtosecond laser direct writing (FsLDW) technique allow making graphene micropatterns arbitrarily according to the preprogrammed structures, which provides the feasibility for rational design, flexible fabrication and integration of graphene-based micro-devices. Raman spectra show that the reduced and patterned region is very homogeneous, which is confirmed by the almost consistent I D /I G ratio. The novel graphene patterning technique would provide a technical support for the development of graphene-based micro-devices for future electronics

  18. High Energy, Single-Mode, All-Solid-State and Tunable UV Laser Transmitter

    Science.gov (United States)

    Prasad, Narasimha S.; Singh, Upendra N.; Hovis, FLoyd

    2007-01-01

    A high energy, single mode, all solid-state Nd:YAG laser primarily for pumping an UV converter is developed. Greater than 1 J/pulse at 50 HZ PRF and pulse widths around 22 ns have been demonstrated. Higher energy, greater efficiency may be possible. Refinements are known and practical to implement. Technology Demonstration of a highly efficient, high-pulse-energy, single mode UV wavelength generation using flash lamp pumped laser has been achieved. Greater than 90% pump depletion is observed. 190 mJ extra-cavity SFG; IR to UV efficiency > 21% (> 27% for 1 mJ seed). 160 mJ intra-cavity SFG; IR to UV efficiency up to 24% Fluence laser is being refined to match or exceed the above UV converter results. Currently the Nd:YAG pump laser development is a technology demonstration. System can be engineered for compact packaging.

  19. Analysis of UV-excited fluorochromes by flow cytometry using near-ultraviolet laser diodes.

    Science.gov (United States)

    Telford, William G

    2004-09-01

    Violet laser diodes have become common and reliable laser sources for benchtop flow cytometers. While these lasers are very useful for a variety of violet and some ultraviolet-excited fluorochromes (e.g., DAPI), they do not efficiently excite most UV-stimulated probes. In this study, the next generation of InGaN near-UV laser diodes (NUVLDs) emitting in the 370-375-nm range have been evaluated as laser sources for cuvette-based flow cytometers. Several NUVLDs, ranging in wavelength from 370 to 374 nm and in power level from 1.5 to 10 mW, were mounted on a BD Biosciences LSR II and evaluated for their ability to excite cells labeled with the UV DNA binding dye DAPI, several UV phenotyping fluorochromes (including Alexa Fluor 350, Marina Blue, and quantum dots), and the fluorescent calcium chelator indo-1. NUVLDs at the 8-10-mW power range gave detection sensitivity levels comparable to more powerful solid-state and ion laser sources, using low-fluorescence microsphere beads as measurement standards. NUVLDs at all tested power levels allowed extremely high-resolution DAPI cell cycle analysis, and sources in the 8-10-mW power range excited Alexa Fluor 350, Marina Blue, and a variety of quantum dots at virtually the same signal-to-noise ratios as more powerful UV sources. These evaluations indicate that near-UV laser diodes installed on a cuvette-based flow cytometer performed nearly as well as more powerful solid-state UV lasers on the same instrumentation, and comparably to more powerful ion lasers on a jet-in-air system, and. Despite their limited power, integration of these small and inexpensive lasers into benchtop flow cytometers should allow the use of flow cytometric applications requiring UV excitation on a wide variety of instruments. Copyright 2004 Wiley-Liss, Inc.

  20. Polycrystalline diamond film UV detectors for excimer lasers

    International Nuclear Information System (INIS)

    Ralchenko, V G; Savel'ev, A V; Konov, Vitalii I; Mazzeo, G; Spaziani, F; Conte, G; Polyakov, V I

    2006-01-01

    Photoresistive metal-semiconductor-metal detectors based on polycrystalline diamond films are fabricated for recording cw and pulsed UV radiation. The detectors have a high spectral selectivity (the UV-to-VIS response ratio is ∼10 5 ) and a temporal resolution of the order of 10 9 s. 'Solar-blind' photostable diamond detectors are promising for applications in UV lithography, laser micromachining, medicine, and space research. (letters)

  1. Factors affecting color strength of printing on film-coated tablets by UV laser irradiation: TiO2 particle size, crystal structure, or concentration in the film, and the irradiated UV laser power.

    Science.gov (United States)

    Hosokawa, Akihiro; Kato, Yoshiteru

    2011-08-01

    The purpose of this article is to study factors affecting color strength of printing on film-coated tablets by ultraviolet (UV) laser irradiation: particle size, crystal structure, or concentration of titanium dioxide (TiO2) in film, and irradiated UV laser power. Hydroxypropylmethylcellulose films containing 4.0% of TiO2, of which BET particle sizes were ranging from 126.1 to 219.8 nm, were irradiated 3.14W of UV laser at a wavelength 355 nm to study effects of TiO2 particle size and crystal structure on the printing. The films containing TiO2 concentration ranging from 1.0 to 7.7% were irradiated 3.14 or 5.39W of the UV laser to study effect of TiO2 concentration on the printing. The film containing 4.0% of TiO2, was irradiated the UV laser up to 6.42W to study effect of the UV laser power on the printing. The color strength of the printed films was estimated by a spectrophotometer as total color difference (dE). Particle size, crystal structure, and concentration of TiO2 in the films did not affect the printing. In the relationship between the irradiated UV laser power and dE, there found an inflection point (1.6W). When the UV laser power was below 1.6W, the films were not printed. When it was beyond the point, total color difference increased linearly in proportion with the irradiated laser power. The color strength of the printing on film was not changed by TiO2 particle size, crystal structure, and concentration, but could be controlled by regulating the irradiated UV laser power beyond the inflection point.

  2. Hybrid 2D patterning using UV laser direct writing and aerosol jet printing of UV curable polydimethylsiloxane

    Science.gov (United States)

    Obata, Kotaro; Schonewille, Adam; Slobin, Shayna; Hohnholz, Arndt; Unger, Claudia; Koch, Jürgen; Suttmann, Oliver; Overmeyer, Ludger

    2017-09-01

    The hybrid technique of aerosol jet printing and ultraviolet (UV) laser direct writing was developed for 2D patterning of thin film UV curable polydimethylsiloxane (PDMS). A dual atomizer module in an aerosol jet printing system generated aerosol jet streams from material components of the UV curable PDMS individually and enables the mixing in a controlled ratio. Precise control of the aerosol jet printing achieved the layer thickness of UV curable PDMS as thin as 1.6 μm. This aerosol jet printing system is advantageous because of its ability to print uniform thin-film coatings of UV curable PDMS on planar surfaces as well as free-form surfaces without the use of solvents. In addition, the hybrid 2D patterning using the combination of UV laser direct writing and aerosol jet printing achieved selective photo-initiated polymerization of the UV curable PDMS layer with an X-Y resolution of 17.5 μm.

  3. Microfabrication in free-standing gallium nitride using UV laser micromachining

    International Nuclear Information System (INIS)

    Gu, E.; Howard, H.; Conneely, A.; O'Connor, G.M.; Illy, E.K.; Knowles, M.R.H.; Edwards, P.R.; Martin, R.W.; Watson, I.M.; Dawson, M.D.

    2006-01-01

    Gallium nitride (GaN) and related alloys are important semiconductor materials for fabricating novel photonic devices such as ultraviolet (UV) light-emitting diodes (LEDs) and vertical cavity surface-emitting lasers (VCSELs). Recent technical advances have made free-standing GaN substrates available and affordable. However, these materials are strongly resistant to wet chemical etching and also, low etch rates restrict the use of dry etching. Thus, to develop alternative high-resolution processing for these materials is increasingly important. In this paper, we report the fabrication of microstructures in free-standing GaN using pulsed UV lasers. An effective method was first developed to remove the re-deposited materials due to the laser machining. In order to achieve controllable machining and high resolution in GaN, machining parameters were carefully optimised. Under the optimised conditions, precision features such as holes (through holes, blind or tapered holes) on a tens of micrometer length scale have been machined. To fabricate micro-trenches in GaN with vertical sidewalls and a flat bottom, different process strategies of laser machining were tested and optimised. Using this technique, we have successfully fabricated high-quality micro-trenches in free-standing GaN with various widths and depths. The approach combining UV laser micromachining and other processes is also discussed. Our results demonstrate that the pulsed UV laser is a powerful tool for fabricating precision microstructures and devices in gallium nitride

  4. UV laser-assisted fabrication of ridge waveguides in lithium niobate crystals

    OpenAIRE

    Sones, C.L.; Ying, C.Y.J.; Eason, R.W.; Mailis, S.; Ganguly, P.; Soergel, E.

    2010-01-01

    We present a UV laser-assisted method for the fabrication of ridge waveguides in lithium niobate. The UV laser irradiation step provides the refractive index change required for the vertical light confinement in the waveguide and also defines the ferroelectric domain pattern which produces the ridge structures after chemical etching.

  5. UV laser cleaving of air-polymer structured fibre

    NARCIS (Netherlands)

    Canning, J.; Buckley, E.; Groothoff, N.; Luther-Davies, B.; Zagari, J.

    2002-01-01

    The demonstration of ultraviolet (UV) laser ablation technique for cleaving of air-polymer structure (APF) fiber was presented. ArF exciplex laser with an unstable resonator cavity with pulse-to-pulse intensity fluctuations was used for the study. The thermal diffusion time across a 200 µm diameter

  6. Femtosecond UV-laser pulses to unveil protein-protein interactions in living cells.

    Science.gov (United States)

    Itri, Francesco; Monti, Daria M; Della Ventura, Bartolomeo; Vinciguerra, Roberto; Chino, Marco; Gesuele, Felice; Lombardi, Angelina; Velotta, Raffaele; Altucci, Carlo; Birolo, Leila; Piccoli, Renata; Arciello, Angela

    2016-02-01

    A hallmark to decipher bioprocesses is to characterize protein-protein interactions in living cells. To do this, the development of innovative methodologies, which do not alter proteins and their natural environment, is particularly needed. Here, we report a method (LUCK, Laser UV Cross-linKing) to in vivo cross-link proteins by UV-laser irradiation of living cells. Upon irradiation of HeLa cells under controlled conditions, cross-linked products of glyceraldehyde-3-phosphate dehydrogenase (GAPDH) were detected, whose yield was found to be a linear function of the total irradiation energy. We demonstrated that stable dimers of GAPDH were formed through intersubunit cross-linking, as also observed when the pure protein was irradiated by UV-laser in vitro. We proposed a defined patch of aromatic residues located at the enzyme subunit interface as the cross-linking sites involved in dimer formation. Hence, by this technique, UV-laser is able to photofix protein surfaces that come in direct contact. Due to the ultra-short time scale of UV-laser-induced cross-linking, this technique could be extended to weld even transient protein interactions in their native context.

  7. Spectral dependence of some UV-B and UV-C responses of Tetrahymena pyriformis irradiated with dye laser generated UV

    International Nuclear Information System (INIS)

    Calkins, John; Colley, Ed; Wheeler, John; Kentucky Univ., Lexington

    1987-01-01

    We have generated UV-B and UV-C radiations using a flashlamp driven tunable dye laser combined with frequency doubling crystals. Using this novel UV source, we have investigated lethality and its modification by growth phase, photoreactivation and caffeine in Tetrahymena pyriformis at 254 nm and from 260-315 nm in 5 nm steps. From the observed responses we have constructed action spectra for lethality, with or without caffeine (a repair inhibitor) and under conditions of photoreactivation. We have also estimated quantum efficiencies for these responses. Our observations suggest that complex changes in response occur at several wavelengths over the UV-C and UV-B regions. (author)

  8. Generation of various carbon nanostructures in water using IR/UV laser ablation

    International Nuclear Information System (INIS)

    Mortazavi, Seyedeh Zahra; Parvin, Parviz; Reyhani, Ali; Mirershadi, Soghra; Sadighi-Bonabi, Rasoul

    2013-01-01

    A wide variety of carbon nanostructures were generated by a Q-switched Nd : YAG laser (1064 nm) while mostly nanodiamonds were created by an ArF excimer laser (193 nm) in deionized water. They were characterized by transmission electron microscopy, Raman spectroscopy and x-ray photoelectron spectroscopy. It was found that the IR laser affected the morphology and structure of the nanostructures due to the higher inverse bremsstrahlung absorption rate within the plasma plume with respect to the UV laser. Moreover, laser-induced breakdown spectroscopy was carried out so that the plasma created by the IR laser was more energetic than that generated by the UV laser. (paper)

  9. High speed micromachining with high power UV laser

    Science.gov (United States)

    Patel, Rajesh S.; Bovatsek, James M.

    2013-03-01

    Increasing demand for creating fine features with high accuracy in manufacturing of electronic mobile devices has fueled growth for lasers in manufacturing. High power, high repetition rate ultraviolet (UV) lasers provide an opportunity to implement a cost effective high quality, high throughput micromachining process in a 24/7 manufacturing environment. The energy available per pulse and the pulse repetition frequency (PRF) of diode pumped solid state (DPSS) nanosecond UV lasers have increased steadily over the years. Efficient use of the available energy from a laser is important to generate accurate fine features at a high speed with high quality. To achieve maximum material removal and minimal thermal damage for any laser micromachining application, use of the optimal process parameters including energy density or fluence (J/cm2), pulse width, and repetition rate is important. In this study we present a new high power, high PRF QuasarR 355-40 laser from Spectra-Physics with TimeShiftTM technology for unique software adjustable pulse width, pulse splitting, and pulse shaping capabilities. The benefits of these features for micromachining include improved throughput and quality. Specific example and results of silicon scribing are described to demonstrate the processing benefits of the Quasar's available power, PRF, and TimeShift technology.

  10. Single-mode, All-Solid-State Nd:YAG Laser Pumped UV Converter

    Science.gov (United States)

    Prasad, Narasimha S.; Armstrong, Darrell, J.; Edwards, William C.; Singh, Upendra N.

    2008-01-01

    In this paper, the status of a high-energy, all solid-state Nd:YAG laser pumped nonlinear optics based UV converter development is discussed. The high-energy UV transmitter technology is being developed for ozone sensing applications from space based platforms using differential lidar technique. The goal is to generate greater than 200 mJ/pulse with 10-50 Hz PRF at wavelengths of 308 nm and 320 nm. A diode-pumped, all-solid-state and single longitudinal mode Nd:YAG laser designed to provide conductively cooled operation at 1064 nm has been built and tested. Currently, this pump laser provides an output pulse energy of >1 J/pulse at 50 Hz PRF and a pulsewidth of 22 ns with an electrical-to-optical system efficiency of greater than 7% and a M(sup 2) value of UV converter arrangement basically consists of an IR Optical Parametric Oscillator (OPO) and a Sum Frequency Generator (SFG) setups that are pumped by 532 nm wavelength obtained via Second Harmonic Generation (SHG). In this paper, the operation of an inter cavity SFG with CW laser seeding scheme generating 320 nm wavelength is presented. Efforts are underway to improve conversion efficiency of this mJ class UV converter by modifying the spatial beam profile of the pump laser.

  11. Interaction of UV laser pulses with reactive dusty plasmas

    NARCIS (Netherlands)

    van de Wetering, F.M.J.H.; Beckers, J.; Nijdam, S.; Oosterbeek, W.; Kovacevic, E.; Berndt, J.

    2016-01-01

    This contribution deals with the effects of UV photons on the synthesis and transport of nanoparticles in reactive complex plasmas (capacitively coupled RF discharge). First measurements showed that the irradiation of a reactive acetylene-argon plasma with high-energy, ns UV laser pulses (355 nm, 75

  12. Development of pulsed UV lasers and their application in laser spectroscopy

    International Nuclear Information System (INIS)

    De la Rosa, M I; Perez, C; Gruetzmacher, K; GarcIa, D; Bustillo, A

    2011-01-01

    The application of two-photon laser spectroscopy to plasma diagnostics requires tuneable UV-laser spectrometers providing: some mJ pulse energy at ns time scale with spectral quality close to Fourier Transform Limit, good pulse to pulse reproducibility and tuning linearity. We report about two different systems, a first laser specially optimized for the radiation at 243 nm, which is required for the 1S-2S two photon transition of atomic hydrogen, and a second one generating 205 nm suited for the transition 1S - 3S/3D.

  13. Masking considerations in chemically assisted ion beam etching of GaAs/AlGaAs laser structures

    International Nuclear Information System (INIS)

    Behfar-Rad, A.; Wong, S.S.; Davis, R.J.; Wolf, E.D.; Cornell Univ., Ithaca, NY

    1989-01-01

    The use of photoresist, Cr, and SiO 2 as etch masks for GaAs/AlGaAs structures in chemically assisted ion beam etching is reported. The optimized etch with a photoresist mask results in a high degree of anisotropy and smooth sidewalls. However, the etched surface contains undesirable features. The etch with a Cr mask is also highly anisotropic, and the etched surface is free of features. The drawback with Cr masks is that the sidewalls are rough. Vertical and smooth sidewalls as well as a featureless surface are obtained with a SiO 2 mask. The SiO 2 mask has been employed to etch the facets of monolithic GaAs/AlGaAs-based laser structures

  14. Regular self-microstructuring on CR39 using high UV laser dose

    International Nuclear Information System (INIS)

    Parvin, P.; Refahizadeh, M.; Mortazavi, S.Z.; Silakhori, K.; Mahdiloo, A.; Aghaii, P.

    2014-01-01

    The UV laser induced replicas in the form of self-lining microstructures are created by high dose (with high fluence) ArF laser irradiation on CR39. Microstructures as the self-induced contours, in the form of concentric circles, appear when the laser fluence is well above the ablation threshold. It leads to the regular periodic parallel lines, i.e. circles with large radii having spatial separation 100–200 nm and line width 300–600 nm, where the number of shots increases to achieve higher UV doses. The surface wettability is also investigated after laser texturing to exhibit that a notable hydrophilicity takes place at high doses.

  15. Ultrafast pre-breakdown dynamics in Al₂O₃SiO₂ reflector by femtosecond UV laser spectroscopy.

    Science.gov (United States)

    Du, Juan; Li, Zehan; Xue, Bing; Kobayashi, Takayoshi; Han, Dongjia; Zhao, Yuanan; Leng, Yuxin

    2015-06-29

    Ultrafast carrier dynamics in Al2O3/SiO2 high reflectors has been investigated by UV femtosecond laser. It is identified by laser spectroscopy that, the carrier dynamics contributed from the front few layers of Al2O3 play a dominating role in the initial laser-induced damage of the UV reflector. Time-resolved reflection decrease after the UV excitation is observed, and conduction electrons is found to relaxed to a mid-gap defect state locating about one photon below the conduction band . To interpret the laser induced carrier dynamics further, a theoretical model including electrons relaxation to a mid-gap state is built, and agrees very well with the experimental results.. To the best of our knowledge, this is the first study on the pre-damage dynamics in UV high reflector induced by femtosecond UV laser.

  16. High efficiency single frequency 355 nm all-solid-state UV laser

    International Nuclear Information System (INIS)

    Xie, Xiaobing; Wei, Daikang; Ma, Xiuhua; Li, Shiguang; Liu, Jiqiao; Zhu, Xiaolei; Chen, Weibiao

    2016-01-01

    A novel conductively cooled high energy single-frequency 355 nm all-solid-state UV laser is presented based on sum-frequency mixing technique. In this system, a pulsed seeder laser at 1064 nm wavelength, modulated by an AOM, is directly amplified by the cascaded multi-stage hybrid laser amplifiers, and two LBO crystals are used for the SHG and SFG, finally a maximum UV pulse energy of 226 mJ at 355 nm wavelength is achieved with frequency-tripled conversion efficiency as high as 55%, the pulse width is around 12.2 ns at the repetition frequency of 30 Hz. The beam quality factor M 2 of the output UV laser is measured to be 2.54 and 2.98 respectively in two orthogonal directions. (paper)

  17. Investigations of uv TEA N/sub 2/ lasers

    Energy Technology Data Exchange (ETDEWEB)

    Santa, I; Racz, B; Kozma, L; Nemet, B

    1978-01-01

    A simple transversely excited atmospheric (TEA) nitrogen uv laser with double Blumlein-circuit switched by triggered spark gap was investigated. The Blumlein-circuits were based on flatplate wave guide and ceramic capacitors, as well. The output laser energy and the pulse shape exhibited strong dependence on the setting of the angle between the two laser electrodes, but less on the electrode separation. The minimum flowing rate to obtain the maximum output energy was determined at 25 and 50 Hz repetition rate.

  18. Plume characteristics and dynamics of UV and IR laser-desorbed oligonucleotides.

    Science.gov (United States)

    Merrigan, Tony L; Timson, David J; Hunniford, C Adam; Catney, Martin; McCullough, Robert W

    2012-05-01

    Laser desorption of dye-tagged oligonucleotides was studied using laser-induced fluorescence imaging. Desorption with ultra violet (UV) and infra-red (IR) lasers resulted in forward directed plumes of molecules. In the case of UV desorption, the initial shot desorbed approximately seven-fold more material than subsequent shots. In contrast, the initial shot in IR desorption resulted in the ejection of less material compared to subsequent shots and these plumes had a component directed along the path of the laser. Thermal equilibrium of the molecules in the plume was achieved after approximately 25 μs with a spread in molecular temperature which was described by a modified Maxwell-Boltzmann equation. Copyright © 2012 Elsevier B.V. All rights reserved.

  19. UV laser micromachining of piezoelectric ceramic using a pulsed Nd:YAG laser

    International Nuclear Information System (INIS)

    Zeng, D.W.; Xie, C.S.; Li, K.; Chan, H.L.W.; Choy, C.L.; Yung, K.C.

    2004-01-01

    UV laser (λ=355 nm) ablation of piezoelectric lead zirconate titanate (PZT) ceramics in air has been investigated under different laser parameters. It has been found that there is a critical pulse number (N=750). When the pulse number is smaller than the critical value, the ablation rate decreases with increasing pulse number. Beyond the critical value, the ablation rate becomes constant. The ablation rate and concentrations of O, Zr and Ti on the ablated surface increase with the laser fluence, while the Pb concentration decreases due to the selective evaporation of PbO. The loss of the Pb results in the formation of a metastable pyrochlore phase. ZrO 2 was detected by XPS in the ablated zone. Also, the concentrations of the pyrochlore phase and ZrO 2 increase with increasing laser fluence. These results clearly indicate that the chemical composition and phase structure in the ablated zone strongly depend on the laser fluence. The piezoelectric properties of the cut PZT ceramic samples completely disappear due to the loss of the Pb and the existence of the pyrochlore phase. After these samples were annealed at 1150 C for 1 h in a PbO-controlled atmosphere, their phase structure and piezoelectric properties were recovered again. Finally, 1-3 and concentric-ring 2-2 PZT/epoxy composites were fabricated by UV laser micromachining and their thickness modes were measured by impedance spectrum analysis and a d 33 meter. Both composites show high piezoelectric properties. (orig.)

  20. Kinetic processes in a laser-heated helium--nitrogen plasma for use as a uv laser medium

    International Nuclear Information System (INIS)

    Brown, R.T.

    1975-01-01

    Experimental and theoretical studies of an optically pumped electric discharge laser in helium-nitrogen mixtures are described. While the inherent efficiency of this system is rather low, these studies illustrate the basic parameters controlling the dynamics and efficiency of such a laser. In the experiments, intense diffuse discharges were obtained at pressures up to 12 atm and amplified spontaneous emission along the axis of the discharge was observed. The numerical modeling studies showed qualitative agreement with the experimental data and gave an optimized value of the kinetic coupling efficiency (absorbed 10.6-μ power to uv laser power) of 1.6% and of the total efficiency (energy stored in the TEA laser supply to uv output energy) of 0.1 to 0.2%

  1. Rydberg excitation of neutral nitric oxide molecules in strong UV and near-IR laser fields

    International Nuclear Information System (INIS)

    Lv Hang; Zhang Jun-Feng; Zuo Wan-Long; Xu Hai-Feng; Jin Ming-Xing; Ding Da-Jun

    2015-01-01

    Rydberg state excitations of neutral nitric oxide molecules are studied in strong ultraviolet (UV) and near-infra-red (IR) laser fields using a linear time-of-flight (TOF) mass spectrometer with the pulsed electronic field ionization method. The yield of Rydberg molecules is measured as a function of laser intensity and ellipticity, and the results in UV laser fields are compared with those in near-IR laser fields. The present study provides the first experimental evidence of neutral Rydberg molecules surviving in a strong laser field. The results indicate that a rescattering-after-tunneling process is the main contribution to the formation of Rydberg molecules in strong near-IR laser fields, while multi-photon excitation may play an important role in the strong UV laser fields. (paper)

  2. Experimental studies of X-UV rays by a laser plasma: X-UV strioscopy by means of multilayer mirrors

    International Nuclear Information System (INIS)

    Lutrin, F.

    1996-01-01

    This thesis studies a new instrument -from its conception to the measures interpretation- that analyses electronic density gradient in the super critical transportation area of a laser plasma (0,35 μm). This device, so-called of X-UV Schlieren, is based on the refraction property of a probe beam by an index gradient. Its specificity is the use of the X-UV emission at 13 nm (92 eV) of another laser plasma as X-UV probe. The conception and characterization of this instrument are defined thanks to both the emissivity and reflectivity properties of laser plasmas and the reflectivity properties of multilayers. Within this report are presented strioscopy images, spatially and spectrally resolved of an aluminium plasma from a 3.10 12 W/cm 2 laser flux, probed by a 13 nm wavelength. The device has to be closely aligned so as to obtain good contrast and good spatial resolution. For the first time, the refraction of a X-UV probe beam by a laser plasma is displayed. The experiments show that this refraction is all the more obvious for a gold probe plasma of energy 105 J and an aluminium probed plasma of energy 1 J. According to our plasma hydrodynamic simulation, the detected refraction corresponds to an electronic density gradient of 6,5.10 25 electrons/cm 4 in the two first microns of the sur-critical area. To study the parameters dependence of this gradient in the sur-critical area, several solutions for improving the instrument are produced. (author)

  3. Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

    International Nuclear Information System (INIS)

    Chen Meng; Xiang Xia; Jiang Yong; Zu Xiaotao; Yuan Xiaodong; Zheng Wanguo; Wang Haijun; Li Xibin; Lu Haibing; Jiang Xiaodong; Wang Chengcheng

    2010-01-01

    Acid etching combined with UV laser conditioning is developed to enhance the laser induced damage threshold (LIDT) of fused silica. Firstly, the fused silica is etched for 1 ∼ 100 min with a buffered 1% HF solution. After acid etching, its transmittance, surface roughness and LIDT are measured. The results reveal that the fused silica has the highest LIDT and transmittance after etching for 10 min. Then UV laser (355 nm) conditioning is adopted to process the 10-min-etched fused silica. When the laser fluence is below 60% of fused silica's zero probability damage threshold, the LIDT increases gradually with the increase of laser conditioning fluence. However, the LIDT rapidly decreases to be lower than the threshold of the 10-min-etched fused silica when the conditioning fluence is up to 80% of the threshold. Proper acid etching and laser conditioning parameters will effectively enhance the laser damage resistance of fused silica. (authors)

  4. Pulsed UV laser technologies for ophthalmic surgery

    International Nuclear Information System (INIS)

    Razhev, A M; Bagayev, S N; Churkin, D S; Kargapol’tsev, E S; Chernykh, V V; Iskakov, I A; Ermakova, O V

    2017-01-01

    The paper provides an overview of the results of multiyear joint researches of team of collaborators of Institute of Laser Physics SB RAS together with NF IRTC “Eye Microsurgery” for the period from 1988 to the present, in which were first proposed and experimentally realized laser medical technologies for correction of refractive errors of known today as LASIK, the treatment of ophthalmic herpes and open-angle glaucoma. It is proposed to carry out operations for the correction of refractive errors the use of UV excimer KrCl laser with a wavelength of 222 nm. The same laser emission is the most suitable for the treatment of ophthalmic herpes, because it has a high clinical effect, combined with many years of absence of recrudescence. A minimally invasive technique of glaucoma operations using excimer XeCl laser (λ=308 nm) is developed. Its wavelength allows perform all stages of glaucoma operations, while the laser head itself has high stability and lifetime, will significantly reduce operating costs, compared with other types of lasers. (paper)

  5. APPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKS

    Directory of Open Access Journals (Sweden)

    S. M. Avakov

    2007-01-01

    Full Text Available Following the concept of defect-free manufacturing of master masks of IC on photo-masks, two Belarusian sets of optomechanical equipment for 0,3 5 p and 90 nanometers are presented in the paper. Each of the sets comprises:   • Multi-channel laser pattern generator; • Automatic mask defect inspection system; • Laser-based mask defect repair system.The paper contains description of automatic mask defect inspection process during photo-mask manufacturing and respective basic technological operations of the processes.Advantages of a complex approach to the development of a set of opto-mechanical equipment for defect-free manufacturing of photo-masks have been analyzed in the paper. 

  6. Radioactive decontamination through UV laser

    International Nuclear Information System (INIS)

    Delaporte, Ph.; Gastaud, M.; Sentis, M.; Uteza, O.; Marine, W.; Thouvenot, P.; Alcaraz, J.L.; Le Samedy, J.M.; Blin, D.

    2003-01-01

    A device allowing the radioactive decontamination of metal surfaces through the use of a pulsed UV laser has been designed and tested. This device is composed of a 1 kW excimer laser linked to a bundle of optic fibers and of a system to recover particles and can operate in active zones. Metal surfaces have the peculiarities to trap radio-elements in a superficial layer of oxide that can be eaten away by laser radiation. Different contaminated metals (stainless steels, INCONEL and aluminium) issued from the nuclear industry have been used for the testing. The most important contaminants were 60 Co, 137 Cs, 154-155 Eu and 125 Sb. The ratio of decontamination was generally of 10 and the volume of secondary wastes generating during the process was very low compared with other decontamination techniques. A decontamination speed of 1 m 2 /h has been reached for aluminium. The state of the surface is an important parameter because radio-elements trapped in micro-cracks are very difficult to remove. (A.C.)

  7. Single-mode solid-state polymer dye laser fabricated with standard I-line UV lithography

    DEFF Research Database (Denmark)

    Balslev, Søren; Mironov, Andrej; Nilsson, Daniel

    2005-01-01

    We present single-mode solid-state polymer dye lasers fabricated with standard UV lithography. The lasers use a high-order Bragg grating and rely on index-tuning of a photosensitive polymer for waveguiding. The gain medium is Rhodamine 6G.......We present single-mode solid-state polymer dye lasers fabricated with standard UV lithography. The lasers use a high-order Bragg grating and rely on index-tuning of a photosensitive polymer for waveguiding. The gain medium is Rhodamine 6G....

  8. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

    Science.gov (United States)

    Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

    2011-03-01

    Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

  9. Modeling of Output Characteristics of a UV Cu+ Ne-CuBr Laser

    Directory of Open Access Journals (Sweden)

    Snezhana Georgieva Gocheva-Ilieva

    2012-01-01

    Full Text Available This paper examines experiment data for a Ne-CuBr UV copper ion laser excited by longitudinal pulsed discharge emitting in multiline regime. The flexible multivariate adaptive regression splines (MARSs method has been used to develop nonparametric regression models describing the laser output power and service life of the devices. The models have been constructed as explicit functions of 9 basic input laser characteristics. The obtained models account for local nonlinearities of the relationships within the various multivariate subregions. The built best MARS models account for over 98% of data. The models are used to estimate the investigated output laser characteristics of existing UV lasers. The capabilities for using the models in predicting existing and future experiments have been demonstrated. Specific analyses have been presented comparing the models with actual experiments. The obtained results are applicable for guiding and planning the engineering experiment. The modeling methodology can be applied for a wide range of similar lasers and laser devices.

  10. Electrically Injected UV-Visible Nanowire Lasers

    Energy Technology Data Exchange (ETDEWEB)

    Wang, George T.; Li, Changyi; Li, Qiming; Liu, Sheng; Wright, Jeremy Benjamin; Brener, Igal; Luk, Ting -Shan; Chow, Weng W.; Leung, Benjamin; Figiel, Jeffrey J.; Koleske, Daniel D.; Lu, Tzu-Ming

    2015-09-01

    There is strong interest in minimizing the volume of lasers to enable ultracompact, low-power, coherent light sources. Nanowires represent an ideal candidate for such nanolasers as stand-alone optical cavities and gain media, and optically pumped nanowire lasing has been demonstrated in several semiconductor systems. Electrically injected nanowire lasers are needed to realize actual working devices but have been elusive due to limitations of current methods to address the requirement for nanowire device heterostructures with high material quality, controlled doping and geometry, low optical loss, and efficient carrier injection. In this project we proposed to demonstrate electrically injected single nanowire lasers emitting in the important UV to visible wavelengths. Our approach to simultaneously address these challenges is based on high quality III-nitride nanowire device heterostructures with precisely controlled geometries and strong gain and mode confinement to minimize lasing thresholds, enabled by a unique top-down nanowire fabrication technique.

  11. Photolithography-free laser-patterned HF acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass

    International Nuclear Information System (INIS)

    Zamuruyev, Konstantin O; Zrodnikov, Yuriy; Davis, Cristina E

    2017-01-01

    Excellent chemical and physical properties of glass, over a range of operating conditions, make it a preferred material for chemical detection systems in analytical chemistry, biology, and the environmental sciences. However, it is often compromised with SU8, PDMS, or Parylene materials due to the sophisticated mask preparation requirements for wet etching of glass. Here, we report our efforts toward developing a photolithography-free laser-patterned hydrofluoric acid-resistant chromium-polyimide tape mask for rapid prototyping of microfluidic systems in glass. The patterns are defined in masking layer with a diode-pumped solid-state laser. Minimum feature size is limited to the diameter of the laser beam, 30 µ m; minimum spacing between features is limited by the thermal shrinkage and adhesive contact of the polyimide tape to 40 µ m. The patterned glass substrates are etched in 49% hydrofluoric acid at ambient temperature with soft agitation (in time increments, up to 60 min duration). In spite of the simplicity, our method demonstrates comparable results to the other current more sophisticated masking methods in terms of the etched depth (up to 300 µ m in borosilicate glass), feature under etch ratio in isotropic etch (∼1.36), and low mask hole density. The method demonstrates high yield and reliability. To our knowledge, this method is the first proposed technique for rapid prototyping of microfluidic systems in glass with such high performance parameters. The proposed method of fabrication can potentially be implemented in research institutions without access to a standard clean-room facility. (paper)

  12. High aspect ratio silicon nanomoulds for UV embossing fabricated by directional thermal oxidation using an oxidation mask

    International Nuclear Information System (INIS)

    Chen, L Q; Chan-Park, Mary B; Yan, Y H; Zhang Qing; Li, C M; Zhang Jun

    2007-01-01

    Nanomoulding is simple and economical but moulds with nanoscale features are usually prohibitively expensive to fabricate because nanolithographic techniques are mostly serial and time-consuming for large-area patterning. This paper describes a novel, simple and inexpensive parallel technique for fabricating nanoscale pattern moulds by silicon etching followed by thermal oxidation. The mask pattern can be made by direct photolithography or photolithography followed by metal overetching for submicron- and nanoscale features, respectively. To successfully make nanoscale channels having a post-oxidation cross-sectional shape similar to that of the original channel, an oxidation mask to promote unidirectional (specifically horizontal) oxide growth is found to be essential. A silicon nitride or metal mask layer prevents vertical oxidation of the Si directly beneath it. Without this mask, rectangular channels become smaller but are V-shaped after oxidation. By controlling the silicon etch depth and oxidation time, moulds with high aspect ratio channels having widths ranging from 500 to 50 nm and smaller can be obtained. The nanomould, when passivated with a Teflon-like layer, can be used for first-generation replication using ultraviolet (UV) nanoembossing and second-generation replication in other materials, such as polydimethylsiloxane (PDMS). The PDMS stamp, which was subsequently coated with Au, was used for transfer printing of Au electrodes with a 600 nm gap which will find applications in plastics nanoelectronics

  13. UV waveguides light fabricated in fluoropolymer CYTOP by femtosecond laser direct writing.

    Science.gov (United States)

    Hanada, Yasutaka; Sugioka, Koji; Midorikawa, Katsumi

    2010-01-18

    We have fabricated optical waveguides inside the UV-transparent polymer, CYTOP, by femtosecond laser direct writing for propagating UV light in biochip applications. Femtosecond laser irradiation is estimated to increase the refractive index of CYTOP by 1.7 x 10(-3) due to partial bond breaking in CYTOP. The waveguide in CYTOP has propagation losses of 0.49, 0.77, and 0.91 dB/cm at wavelengths of 632.8, 355, and 266 nm, respectively.

  14. Response of antioxidant defense system to laser radiation apical meristem of Isatis indigotica seedlings exposed to UV-B.

    Science.gov (United States)

    Chen, Yi-Ping

    2009-07-01

    To determine the response of antioxidant defense system to laser radiation apical meristem of Isatis indigotica seedlings, Isatis indigotica seedlings were subjected to UV-B radiation (10.08 kJ m(-2)) for 8 h day(-1) for 8 days (PAR, 220 micromol m(-2) s(-1)) and then exposed to He-Ne laser radiation (633 nm; 5.23 mW mm(-2); beam diameter: 1.5 mm) for 5 min each day without ambient light radiation. Changes in free radical elimination systems were measured, the results indicate that: (1) UV-B radiation enhanced the concentration of Malondialdahyde (MDA) and decreased the activities of superoxide dismutase (SOD), catalase (CAT) and peroxidase (POD) in seedlings compared with the control. The concentration of MDA was decreased and the activities of SOD, CAT and POD were increased when seedlings were subjected to elevated UV-B damage followed by laser; (2) the concentration of UV absorbing compounds and proline were increased progressively with UV-B irradiation, laser irradiation and He-Ne laser irradiation plus UV-B irradiation compared with the control. These results suggest that laser radiation has an active function in repairing UV-B-induced lesions in seedlings.

  15. Amplification of UV ultrashort pulse laser in e-beam pumped KrF amplifier

    CERN Document Server

    Tang Xiu Zhang; Gong Kun; Ma Wei Yi; Shan Yu Sheng; Wang Nai Yan

    2002-01-01

    Experimental investigations were performed for amplification of ultrashort pulse laser with Heaven-I e-beam pumped KrF amplifier in CIAE. A 50 mJ, 420 fs UV ultrashort pulse was amplified to 2-3 J energy, 1.2 ps pulse duration, and 2TW laser power. Experimental technique such as synchronization were describe, some parameters such as nonlinear absorb coefficient were measured in experiment. As a result, it is possible to achieve ultra-strong UV laser with intensity higher than 10 sup 1 sup 9 W/cm sup 2 in recently years

  16. Amplification of UV ultrashort pulse laser in e-beam pumped KrF amplifier

    International Nuclear Information System (INIS)

    Tang Xiuzhang; Zhang Haifeng; Gong Kun; Ma Weiyi; Shan Yusheng; Wang Naiyan

    2002-01-01

    Experimental investigations were performed for amplification of ultrashort pulse laser with Heaven-I e-beam pumped KrF amplifier in CIAE. A 50 mJ, 420 fs UV ultrashort pulse was amplified to 2-3 J energy, 1.2 ps pulse duration, and 2TW laser power. Experimental technique such as synchronization were describe, some parameters such as nonlinear absorb coefficient were measured in experiment. As a result, it is possible to achieve ultra-strong UV laser with intensity higher than 10 19 W/cm 2 in recently years

  17. He-Ne laser treatment improves the photosynthetic efficiency of wheat exposed to enhanced UV-B radiation

    International Nuclear Information System (INIS)

    Chen, Huize; Han, Rong

    2014-01-01

    The level of ultraviolet-B (UV-B) radiation on the Earth’s surface has increased due to depletion of the ozone layer. Here, we explored the effects of continuous wave He-Ne laser irradiation (632 nm, 5 mW mm –2 , 2 min d –1 ) on the physiological indexes of wheat seedlings exposed to enhanced UV-B radiation (10 KJ m –2 d –1 ) at the early growth stages. Wheat seedlings were irradiated with enhanced UV-B, He-Ne laser treatment or a combination of the two. Enhanced UV-B radiation had deleterious effects on wheat photosynthesis parameters including photosystem II (chlorophyll content, Hill reaction, chlorophyll fluorescence parameters, electron transport rate (ETR), and yield), the thylakoid (optical absorption ability, cyclic photophosphorylation, Mg 2+ -ATPase, and Ca 2+ -ATPase) and some enzymes in the dark reaction (phosphoenolpyruvate carboxylase (PEPC), carbonic anhydrase (CA), malic dehydrogenase (MDH), and chlorophyllase). These parameters were improved in UV-B-exposed wheat treated with He-Ne laser irradiation; the parameters were near control levels and the enzyme activities increased, suggesting that He-Ne laser treatment partially alleviates the injury caused by enhanced UV-B irradiation. Furthermore, the use of He-Ne laser alone had a favourable effect on seedling photosynthesis compared with the control. Therefore, He-Ne laser irradiation can enhance the adaptation capacity of crops. (paper)

  18. UV Laser Diagnostics of the 1-MA Z-pinch Plasmas

    International Nuclear Information System (INIS)

    Altemara, S. D.; Ivanov, V. V.; Astanovitskiy, A. L.; Haboub, A.

    2009-01-01

    The 532 nm laser diagnostic set at the Zebra generator shows the details of the ablation and stagnation phases in cylindrical, planar, and star-like wire arrays but it cannot show the structure of the stagnated z-pinch and the implosion in small diameter loads, 1-3 mm in diameter. The absorption increment and the refraction angle of the 532 nm laser, when passing through the plasma, are too great to obtain quality images. An ultraviolet probing beam at the wavelength of 266 nm was developed to study small-diameter loads and to investigate the structure of the 1-MA z-pinch. The UV radiation has a much smaller absorption increment and refraction angles in plasmas than the 532 nm light and allows for better imaging of the z-pinch plasmas. Estimates showed that UV probing would be able to probe the high-density z-pinch plasma in experiments on the Zebra generator, and the early results of UV probing on the Zebra generator have shown promise.

  19. Laser-induced nanostructures on a polymer irradiated through a contact mask

    Energy Technology Data Exchange (ETDEWEB)

    Neděla, O. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Slepička, P., E-mail: petr.slepicka@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Malý, J.; Štofík, M. [Department of Biology, Faculty of Science, J.E. Purkyně University, 400 96 Usti nad Labem (Czech Republic); Švorčík, V. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)

    2014-12-01

    Highlights: • The unique nanopatterning method of PEN was proposed. • Laser treatment through micrometer slit was utilized. • Dimensions of nanostructures can be precisely controlled. • Laser treatment changes the PEN surface chemistry and morphology (sensor applications). - Abstract: The nanopatterning method applied through micrometer slit for polyethylene naphthalate (PEN) substrate was proposed in this paper. Surface roughness, formation of nanoscale ripple-like structures and the dependence of their dimensions on the value of laser fluence was determined by atomic force and laser confocal microscopy, and compared with values obtained from samples irradiated directly (without a contact mask) under similar conditions. The morphology of the unirradiated surface of the substrate in between the slits is also studied, as well as the morphology of the transitional area between the irradiated and unirradiated surface. Thin layer of gold was deposited on selected samples. Chemical composition of the surface was determined from XPS spectra. The potential application of this research can be found predominantly in the field of selective sensor applications, where the designated area for the consecutive grafting procedures is of great importance.

  20. Once again on the role of UV illumination in non-chain electric-discharge HF(DF) lasers

    International Nuclear Information System (INIS)

    Belevtsev, A A; Kazantsev, S Yu; Saifulin, A V; Firsov, K N

    2004-01-01

    The influence of UV illumination of a discharge gap on the stability and homogeneity of a volume self-sustained discharge (VSD) in working mixtures (SF 6 with hydrocarbons) of a non-chain HF laser is studied in broad ranges of the discharge-current duration and the energy deposition. It is shown that the UV illumination in lasers with the cathode area S≤300 cm 2 and in lasers with the current-pulse duration T≤150 ns stabilises the delay time and the voltage amplitude of the electric breakdown of the gap and leads to the levelling (due to photoeffect) of the VSD current density distribution over the cathode surface. The volume preionisation of the working mixture of a non-chain HF laser by UV radiation is impossible because of strong absorption of this radiation by SF 6 . There is no need in UV illumination in wide-aperture, large-volume lasers when small-scale (∼50 μm) inhomogeneities are present on the cathode surface. (active media)

  1. Single-longitudinal mode distributed-feedback fiber laser with low-threshold and high-efficiency

    Science.gov (United States)

    Jiang, Man; Zhou, Pu; Gu, Xijia

    2018-01-01

    Single-frequency fiber laser has attracted a lot of interest in recent years due to its numerous application potentials in telecommunications, LIDAR, high resolution sensing, atom frequency standard, etc. Phosphate glass fiber is one of the candidates for building compact high gain fiber lasers because of its capability of high-concentration of rare-earth ions doping in fiber core. Nevertheless, it is challenging for the integration of UV-written intra-core fiber Bragg gratings into the fiber laser cavity due to the low photosensitivity of phosphate glass fiber. The research presented in this paper will focus on demonstration of UV-written Bragg gratings in phosphate glass fiber and its application in direct-written short monolithic single-frequency fiber lasers. Strong π-phase shift Bragg grating structure is direct-inscribed into the Er/Yb co-doped gain fiber using an excimer laser, and a 5-cm-long phase mask is used to inscribe a laser cavity into the Er/Yb co-doped phosphate glass fibers. The phase mask is a uniform mask with a 50 μm gap in the middle. The fiber laser device emits output power of 10.44 mW with a slope efficiency of 21.5% and the threshold power is about 42.8 mW. Single-longitudinal mode operation is validated by radio frequency spectrum measurement. Moreover, the output spectrum at the highest power shows an excellent optical signal to noise ratio of about 70 dB. These results, to the best of our knowledge, show the lowest power threshold and highest efficiency among the reports that using the same structure to achieve single-longitudinal mode laser output.

  2. UV laser deposition of metal films by photogenerated free radicals

    Science.gov (United States)

    Montgomery, R. K.; Mantei, T. D.

    1986-01-01

    A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

  3. Grayscale lithography-automated mask generation for complex three-dimensional topography

    Science.gov (United States)

    Loomis, James; Ratnayake, Dilan; McKenna, Curtis; Walsh, Kevin M.

    2016-01-01

    Grayscale lithography is a relatively underutilized technique that enables fabrication of three-dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially modulating ultraviolet (UV) dosage during the writing process, one can vary the depth at which photoresist is developed. This means complex structures and bioinspired designs can readily be produced that would otherwise be cost prohibitive or too time intensive to fabricate. The main barrier to widespread grayscale implementation, however, stems from the laborious generation of mask files required to create complex surface topography. We present a process and associated software utility for automatically generating grayscale mask files from 3-D models created within industry-standard computer-aided design (CAD) suites. By shifting the microelectromechanical systems (MEMS) design onus to commonly used CAD programs ideal for complex surfacing, engineering professionals already familiar with traditional 3-D CAD software can readily utilize their pre-existing skills to make valuable contributions to the MEMS community. Our conversion process is demonstrated by prototyping several samples on a laser pattern generator-capital equipment already in use in many foundries. Finally, an empirical calibration technique is shown that compensates for nonlinear relationships between UV exposure intensity and photoresist development depth as well as a thermal reflow technique to help smooth microstructure surfaces.

  4. Laser Doppler imaging of cutaneous blood flow through transparent face masks: a necessary preamble to computer-controlled rapid prototyping fabrication with submillimeter precision.

    Science.gov (United States)

    Allely, Rebekah R; Van-Buendia, Lan B; Jeng, James C; White, Patricia; Wu, Jingshu; Niszczak, Jonathan; Jordan, Marion H

    2008-01-01

    A paradigm shift in management of postburn facial scarring is lurking "just beneath the waves" with the widespread availability of two recent technologies: precise three-dimensional scanning/digitizing of complex surfaces and computer-controlled rapid prototyping three-dimensional "printers". Laser Doppler imaging may be the sensible method to track the scar hyperemia that should form the basis of assessing progress and directing incremental changes in the digitized topographical face mask "prescription". The purpose of this study was to establish feasibility of detecting perfusion through transparent face masks using the Laser Doppler Imaging scanner. Laser Doppler images of perfusion were obtained at multiple facial regions on five uninjured staff members. Images were obtained without a mask, followed by images with a loose fitting mask with and without a silicone liner, and then with a tight fitting mask with and without a silicone liner. Right and left oblique images, in addition to the frontal images, were used to overcome unobtainable measurements at the extremes of face mask curvature. General linear model, mixed model, and t tests were used for data analysis. Three hundred seventy-five measurements were used for analysis, with a mean perfusion unit of 299 and pixel validity of 97%. The effect of face mask pressure with and without the silicone liner was readily quantified with significant changes in mean cutaneous blood flow (P face masks. Perfusion decreases with the application of pressure and with silicone. Every participant measured differently in perfusion units; however, consistent perfusion patterns in the face were observed.

  5. UV laser induced photochemistry of nitrobenzene and nitrotoluene isomers

    International Nuclear Information System (INIS)

    Kosmidis, C.; Clark, A.; Deas, R.M.; Ledingham, K.W.D.; Marshall, A.; Singhal, R.P.

    1995-01-01

    The photofragmentation of nitrobenzene and the isomers of nitrotoluene in the gas phase are studied in the wavelength region 210-270 nm using a pulsed UV laser in conjunction with a time of flight mass spectrometer. Laser induced mass spectra are analysed and compared with those produced by the electron impact (EI) technique. The generation of the observed fragment ions is explained by invoking different fragmentation pathways followed by these molecules. Observed differences in the mass spectra of the o-, m-, and p-nitrotoluene isomers are discussed as a possible way for a laser based method for their identification. (author)

  6. Morphology of IR and UV Laser-induced Structural Changes on Silicon Surfaces

    International Nuclear Information System (INIS)

    Jimenez-Jarquin, J.; Haro-Poniatowski, E.; Fernandez-Guasti, M.; Hernandez-Pozos, J.L.

    2005-01-01

    Using scanning electronic microscopy, we analyze the structural changes induced in silicon (100) wafers by focused IR (1064 nm) and UV (355 nm) nanosecond laser pulses. The experiments were performed in the laser ablation regime. When a silicon surface is irradiated by laser pulses in an O2 atmosphere conical microstructures are obtained. The changes in silicon surface morphology depend both on the incident radiation wavelength and the environmental atmosphere. We have patterned Si surfaces with a single focused laser spot and, in doing the experiments with IR or UV this reveals significant differences in the initial surface cracking and pattern formation, however the final result consist of an array of microcones when the experiment is carried out in oxygen. We employ a random scanning technique to irradiate silicon surfaces over large areas. In this form we have obtained large patterned areas

  7. Vacuum isostatic micro/macro molding of PTFE materials for laser beam shaping in environmental applications: large scale UV laser water purification

    Science.gov (United States)

    Lizotte, Todd; Ohar, Orest

    2009-08-01

    Accessibility to fresh clean water has determined the location and survival of civilizations throughout the ages [1]. The tangible economic value of water is demonstrated by industry's need for water in fields such as semiconductor, food and pharmaceutical manufacturing. Economic stability for all sectors of industry depends on access to reliable volumes of good quality water. As can be seen on television a nation's economy is seriously affected by water shortages through drought or mismanagement and as such those water resources must therefore be managed both for the public interest and the economic future. For over 50 years ultraviolet water purification has been the mainstay technology for water treatment, killing potential microbiological agents in water for leisure activities such as swimming pools to large scale waste water treatment facilities where the UV light photo-oxidizes various pollutants and contaminants. Well tailored to the task, UV provides a cost effective way to reduce the use of chemicals in sanitization and anti-biological applications. Predominantly based on low pressure Hg UV discharge lamps, the system is plagued with lifetime issues (~1 year normal operation), the last ten years has shown that the technology continues to advance and larger scale systems are turning to more advanced lamp designs and evaluating solidstate UV light sources and more powerful laser sources. One of the issues facing the treatment of water with UV lasers is an appropriate means of delivering laser light efficiently over larger volumes or cross sections of water. This paper examines the potential advantages of laser beam shaping components made from isostatically micro molding microstructured PTFE materials for integration into large scale water purification and sterilization systems, for both lamps and laser sources. Applying a unique patented fabrication method engineers can form micro and macro scale diffractive, holographic and faceted reflective structures

  8. Studies of high repetition rate laser-produced plasma soft-X-ray amplifiers; Etudes d'amplificateurs plasma laser a haute cadence dans le domaine X-UV et applications

    Energy Technology Data Exchange (ETDEWEB)

    Cassou, K

    2006-12-15

    The progress made as well on the Ti:Sa laser system, as in the control and the knowledge of laser produced X-UV sources allowed the construction of a X-UV laser station dedicated to the applications. My thesis work falls under the development of this station and more particularly on the characterization of a X-UV laser plasma amplifier. The experimental study relates to the coupling improvement of the pump infra-red laser with plasma within the framework of the transient collisional X-UV laser generation. These X-UV lasers are generated in a plasma formed by the interaction of a solid target and a laser pulse of approximately 500 ps duration, followed by a second infra-red laser pulse known as of pump (about 5 ps) impinging on the target in grazing incidence. For the first time, a complete parametric study was undertaken on the influence of the grazing angle on the pumping of the amplifying medium. One of the results was to reach very high peak brightness about 10{sup 28} ph/s/mm{sup 2}/mrad{sup 2}/(0.1%bandwidth), which compares well with the free-electron laser brightness. Moreover, we modified then used a new two-dimensional hydrodynamic code with adaptive mesh refinement in order to understand the influence of the space-time properties of the infra-red laser on the formation and the evolution of the amplifying plasma. Our modeling highlighted the interest to use a super Gaussian transverse profile for the line focus leading to an increase in a factor two of the gain region size and a reduction of the electron density gradient by three orders of magnitude. These improvements should strongly increase the energy contained in X-UV laser beam. We thus used X-UV laser to study the appearance of transient defects produced by a laser IR on a beam-splitter rear side. We also began research on the mechanisms of DNA damage induced by a very intense X-UV radiation. (author)

  9. UV and RIR matrix assisted pulsed laser deposition of organic MEH-PPV films

    International Nuclear Information System (INIS)

    Toftmann, B.; Papantonakis, M.R.; Auyeung, R.C.Y.; Kim, W.; O'Malley, S.M.; Bubb, D.M.; Horwitz, J.S.; Schou, J.; Johansen, P.M.; Haglund, R.F.

    2004-01-01

    A comparative study of thin film production based on gentle laser-ablation techniques has been carried out with the luminescent polymer poly[2-methoxy-5-(2'-ethylhexyloxy)-1,4-phenylene vinylene]. Using a free-electron laser films were made by resonant infrared pulsed laser deposition (RIR-PLD). For the first time resonant infrared matrix assisted pulsed laser evaporation (RIR-MAPLE) was successfully demonstrated on a luminescent polymer system. In addition to this, an excimer laser has been used for UV-MAPLE depositions at 193 and 248-nm irradiation. Films deposited onto NaCl and quartz substrates were analyzed by Fourier transform infrared spectroscopy, UV-visible absorbance and photoluminescence. Photoluminescent material was deposited by RIR-MAPLE and 248-nm MAPLE, while the RIR-PLD and 193-nm-MAPLE depositions displayed the smoothest surfaces but did not show photoluminescence

  10. UV and RIR matrix assisted pulsed laser deposition of organic MEH-PPV films

    DEFF Research Database (Denmark)

    Christensen, Bo Toftmann; Papantonalis, M.R.; Auyeung, R.C.Y.

    2004-01-01

    -PLD). For the first time resonant infrared matrix assisted pulsed laser evaporation (RIR-MAPLE) was successfully demonstrated on a luminescent polymer system. In addition to this, an excimer laser has been used for UV-MAPLE depositions at 193 and 248-nm irradiation. Films deposited onto NaCl and quartz substrates......A comparative study of thin film production based on gentle laser-ablation techniques has been carried out with the luminescent polymer poly [2-methoxy-5-(2'-ethylhexyloxy)-1,4-phenylene vinylene]. Using a free-electron laser films were made by resonant infrared pulsed laser deposition (RIR...... were analyzed by Fourier transform infrared spectroscopy, UV-visible absorbance and photoluminescence. Photoluminescent material was deposited by RIR-MAPLE and 248-nm MAPLE, while the RIR-PLD and 193-nm-MAPLE depositions displayed the smoothest surfaces but did not show photoluminescence. (C) 2003...

  11. Dense plasmas interferometry using an X-UV laser. Development of an X-UV Michelson interferometer at 13.9 nm

    International Nuclear Information System (INIS)

    Hubert, S.

    2001-01-01

    After having recalled some aspects related to the physics of plasmas produced by interaction between laser and matter, and related to inertial confinement fusion or ICF (discussion of laser energy absorption, X conversion, parametric and hydrodynamic instabilities, and so on), this research thesis presents various techniques used for plasma diagnosis in order to justify the use of interferometry for the investigation of the electronic density distribution of these plasmas. The physical principle of this diagnosis technique is described and two types of X-UV interferometer are presented, one of them being chosen as more suitable for the study of ICF-type plasmas. The author then describes and reports the experimental investigation performed with a two-mirror Fresnel interferometer and a 21.2 nm zinc X-UV laser: description of the interferometer operation and characteristics, of the specifically designed image system, discussion of plasma interferogram simulations. Then, he reports the development of a Michelson-type X-UV interferometer at 13.9 nm. The operation principle is recalled, and the preliminary modelling phase is reported. The imaging system is presented and results of the interferogram modelling phase are presented [fr

  12. Study of noninvasive detection of latent fingerprints using UV laser

    Science.gov (United States)

    Li, Hong-xia; Cao, Jing; Niu, Jie-qing; Huang, Yun-gang; Mao, Lin-jie; Chen, Jing-rong

    2011-06-01

    Latent fingerprints present a considerable challenge in forensics, and noninvasive procedure that captures a digital image of the latent fingerprints is significant in the field of criminal investigation. The capability of photography technologies using 266nm UV Nd:YAG solid state laser as excitation light source to provide detailed images of unprocessed latent fingerprints is demonstrated. Unprocessed latent fingerprints were developed on various non-absorbent and absorbing substrates. According to the special absorption, reflection, scattering and fluorescence characterization of the various residues in fingerprints (fatty acid ester, protein, and carbosylic acid salts etc) to the UV light to weaken or eliminate the background disturbance and increase the brightness contrast of fingerprints with the background, and using 266nm UV laser as excitation light source, fresh and old latent fingerprints on the surface of four types of non-absorbent objects as magazine cover, glass, back of cellphone, wood desktop paintwork and two types of absorbing objects as manila envelope, notebook paper were noninvasive detected and appeared through reflection photography and fluorescence photography technologies, and the results meet the fingerprint identification requirements in forensic science.

  13. Detection Range Estimation of UV Spectral Band Laser Radar

    Directory of Open Access Journals (Sweden)

    V. A. Gorodnichev

    2014-01-01

    Full Text Available Recently, has come into existence an interest in the systems operating in the ultra-violet (UF band of wavelengths, which use other spectral information (coefficients of reflection or radiation in UF range about location objects, than laser systems in the visible, near or average infrared bands. Thus, a point is not only to receive additional (in another spectral range information on location objects. Laser radiation in the UF spectral band of 0.315 – 0.4 microns is safer than laser radiation with the wavelengths of 0.38 – 1.4 microns.The work presents a comparative estimation of the detection systems range of laser radars in the UV and visible spectral bands for the following wavelengths of radiation:- UF band: 0.266 microns (the fourth harmonic of YAG-laser activated by neodymium ions, 0.308 microns (the XeCl-excimer laser, 0.355 microns (the third harmonic of YAG-laser activated by neodymium ions;- visible band: 0.532 microns (the second harmonic of YAG-laser activated by neodymium ions.Results of calculations show that for the horizontal pathway in the terrestrial atmosphere at the selected radiation wavelengths a detection range is in the range of 2510m – 5690 m.The maximum range of detection corresponds to the visible spectral band. A sweep range decreases with transition to the UF band. This is caused by the fact that with transition to the UF band there is a rise of atmosphere attenuation (generally, because of absorption by ozone, this effect being smoothed by reducing background radiation.In the UF band a wavelength of 0.355 microns is the most acceptable. For this wavelength a detection range is about 1,5 times less (in comparison with the visible band of 0.532 microns. However, this is the much more eye-safe wavelength. With transition to the UV band a detection range decreases not that much and can be compensated by changing parameters of transmitting or receiving channels of laser radar.

  14. Higher pressure periodic CO/sub 2/ laser with non-self-sustaining discharge and UV ionization

    Energy Technology Data Exchange (ETDEWEB)

    Muratov, E A; Pismennyi, V D; Rakhimov, A T

    1979-02-01

    Stimulated emission was achieved in a CO/sub 2/ laser operating at 250 torr excited by a periodic non-self-sustaining discharge controlled by a spark source of UV radiation. Use of a UV source operating in periodic pulse regime is shown to permit quasicontinuous operation of the laser with characteristic radiating times up to several hundred microseconds.

  15. Extended plasma channels created by UV laser in air and their application to control electric discharges

    International Nuclear Information System (INIS)

    Zvorykin, V. D.; Ionin, A. A.; Levchenko, A. O.; Seleznev, L. V.; Sinitsyn, D. V.; Smetanin, I. V.; Ustinovskii, N. N.; Shutov, A. V.

    2015-01-01

    Results are presented from a series of experimental and theoretical studies on creating weakly ionized extended plasma channels in atmospheric air by 248-nm UV laser radiation and their application to control long high-voltage discharges. The main mechanisms of air ionization by UV laser pulses with durations from 100 fs to 25 ns and intensities in the ranges of 3×10 11 –1.5×10 13 and 3×10 6 –3×10 11 W/cm 2 , respectively, which are below the threshold for optical gas breakdown, as well as the main relaxation processes in plasma with a density of 10 9 –10 17 cm −3 , are considered. It is shown that plasma channels in air can be efficiently created by amplitude-modulated UV pulses consisting of a train of subpicosecond pulses producing primary photoelectrons and a long UV pulse suppressing electron attachment and sustaining the density of free electrons in plasma. Different modes of the generation and amplification of trains of subterawatt subpicosecond pulses and amplitude-modulated UV pulses with an energy of several tens of joules were implemented on the GARPUN-MTW hybrid Ti:sapphire-KrF laser facility. The filamentation of such UV laser beams during their propagation in air over distances of up to 100 m and the parameters of the corresponding plasma channels were studied experimentally and theoretically. Laser initiation of high-voltage electric discharges and control of their trajectories by means of amplitude-modulated UV pulses, as well as the spatiotemporal structure of breakdowns in air gaps with length of up to 80 cm, were studied

  16. A proposed high-power UV industrial demonstration laser at CEBAF

    International Nuclear Information System (INIS)

    Benson, S.V.; Bisognano, J.J.; Bohn, C.L.

    1996-01-01

    The Laser Processing Consortium, a collaboration of industries, universities, and the Continuous Electron Beam Accelerator Facility (CEBAF) in Newport News, Virginia, has proposed building a demonstration industrial processing laser for surface treatment and micro-machining. The laser is a free-electron laser (FEL) with average power output exceeding 1 kW in the ultraviolet (UV). The design calls for a novel driver accelerator that recovers most of the energy of the exhaust electron beam to produce laser light with good wall-plug efficiency. The laser and accelerator design use technologies that are scalable to much higher power. The authors describe the critical design issues in the laser such as the stability, power handling, and losses of the optical resonator, and the quality, power, and reliability of the electron beam. They also describe the calculated laser performance. Finally progress to date on accelerator development and resonator modeling will be reported

  17. A proposed high-power UV industrial demonstration laser at CEBAF

    International Nuclear Information System (INIS)

    Benson, S.V.; Bisognano, J.J.; Bohn, C.L.

    1996-01-01

    The Laser Processing Consortium, a collaboration of industries, universities, and the Continuous Electron Beam Accelerator Facility (CEBAF) in Newport News, Virginia, has proposed building a demonstration industrial processing laser for surface treatment and micro-machining. The laser is a free-electron laser (FEL) with average power output exceeding 1 kW in the ultraviolet (UV). The design calls for a novel driver accelerator that recovers most of the energy of the exhaust electron beam to produce laser light with good wall-plug efficiency. The laser and accelerator design use technologies that are scalable to much higher power. The authors will describe the critical design issues in the laser such as the stability, power handling, and losses of the optical resonator, and the quality, power, and reliability of the electron beam. They will also describe the calculated laser performance. Finally progress to date on accelerator development and resonator modeling will be reported

  18. Linear self-focusing of continuous UV laser beam in photo-thermo-refractive glasses.

    Science.gov (United States)

    Sidorov, Alexander I; Gorbyak, Veronika V; Nikonorov, Nikolay V

    2018-03-19

    The experimental and theoretical study of continuous UV laser beam propagation through thick silver-containing photo-thermo-refractive glass is presented. It is shown for the first time that self-action of UV Gaussian beam in glass results in its self-focusing. The observed linear effect is non-reversible and is caused by the transformation of subnanosized charged silver molecular clusters to neutral state under UV laser radiation. Such transformation is accompanied by the increase of molecular clusters polarizability and the refractive index increase in irradiated area. As a result, an extended positive lens is formed in glass bulk. In a theoretical study of linear self-focusing effect, the "aberration-free" approximation was used, taking into account spatial distribution of induced absorption.

  19. QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

    Science.gov (United States)

    Nowak, Krzysztof Michał; Suganuma, Takashi; Kurosawa, Yoshiaki; Ohta, Takeshi; Kawasuji, Yasufumi; Nakarai, Hiroaki; Saitou, Takashi; Fujimoto, Junichi; Mizoguchi, Hakaru; Sumitani, Akira; Endo, Akira

    2017-01-01

    Successful merger of state-of-the-art, semiconductor quantum-cascade lasers (QCL), with the mature CO2 laser technology, resulted in a delivery of highly-desired qualities of CO2 laser output that were not available previously without much effort. These qualities, such as multi-line operation, excellent spectro-temporal stability and pulse waveform control, became available from a single device of moderate complexity. This paper describes the operation principle and the unique properties of the solid{state seeded CO2 laser, invented for an application in laser-produced-plasma (LPP), extreme-UV (EUV) light source.

  20. Comparison of femtosecond laser and continuous wave UV sources for protein-nucleic acid crosslinking.

    Science.gov (United States)

    Fecko, Christopher J; Munson, Katherine M; Saunders, Abbie; Sun, Guangxing; Begley, Tadhg P; Lis, John T; Webb, Watt W

    2007-01-01

    Crosslinking proteins to the nucleic acids they bind affords stable access to otherwise transient regulatory interactions. Photochemical crosslinking provides an attractive alternative to formaldehyde-based protocols, but irradiation with conventional UV sources typically yields inadequate product amounts. Crosslinking with pulsed UV lasers has been heralded as a revolutionary technique to increase photochemical yield, but this method had only been tested on a few protein-nucleic acid complexes. To test the generality of the yield enhancement, we have investigated the benefits of using approximately 150 fs UV pulses to crosslink TATA-binding protein, glucocorticoid receptor and heat shock factor to oligonucleotides in vitro. For these proteins, we find that the quantum yields (and saturating yields) for forming crosslinks using the high-peak intensity femtosecond laser do not improve on those obtained with low-intensity continuous wave (CW) UV sources. The photodamage to the oligonucleotides and proteins also has comparable quantum yields. Measurements of the photochemical reaction yields of several small molecules selected to model the crosslinking reactions also exhibit nearly linear dependences on UV intensity instead of the previously predicted quadratic dependence. Unfortunately, these results disprove earlier assertions that femtosecond pulsed laser sources provide significant advantages over CW radiation for protein-nucleic acid crosslinking.

  1. UV laser-ablated surface textures as potential regulator of cellular response.

    Science.gov (United States)

    Chandra, Prafulla; Lai, Karen; Sung, Hak-Joon; Murthy, N Sanjeeva; Kohn, Joachim

    2010-06-01

    Textured surfaces obtained by UV laser ablation of poly(ethylene terephthalate) films were used to study the effect of shape and spacing of surface features on cellular response. Two distinct patterns, cones and ripples with spacing from 2 to 25 μm, were produced. Surface features with different shapes and spacings were produced by varying pulse repetition rate, laser fluence, and exposure time. The effects of the surface texture parameters, i.e., shape and spacing, on cell attachment, proliferation, and morphology of neonatal human dermal fibroblasts and mouse fibroblasts were studied. Cell attachment was the highest in the regions with cones at ∼4 μm spacing. As feature spacing increased, cell spreading decreased, and the fibroblasts became more circular, indicating a stress-mediated cell shrinkage. This study shows that UV laser ablation is a useful alternative to lithographic techniques to produce surface patterns for controlling cell attachment and growth on biomaterial surfaces.

  2. UV and IR laser ablation for inductively coupled plasma mass spectrometry

    International Nuclear Information System (INIS)

    Smith, M.R.; Koppenaal, D.W.; Farmer, O.T.

    1993-06-01

    Laser ablation particle plume compositions are characterized using inductively coupled plasma mass spectrometry (ICP/MS). This study evaluates the mass response characteristics peculiar to ICP/MS detection as a function of laser fluence and frequency. Evaluation of the ICP/MS mass response allows deductions to be made concerning how representative the laser ablation produced particle plume composition is relative to the targeted sample. Using a black glass standard, elemental fractionation was observed, primarily for alkalis and other volatile elements. The extent of elemental fractionation between the target sample and the sampled plume varied significantly as a function of laser fluences and IR and UV laser frequency

  3. Effects of UV laser micropatterning on frictional performance of diamond-like nanocomposite films

    Science.gov (United States)

    Zavedeev, Evgeny V.; Zilova, Olga S.; Shupegin, Mikhail L.; Barinov, Alexej D.; Arutyunyan, Natalia R.; Roch, Teja; Pimenov, Sergei M.

    2016-11-01

    We report on UV laser modification and micropatterning of diamond-like nanocomposite (DLN) films (a-C:H,Si:O) with nanosecond pulses and effects of laser surface microstructuring on the frictional performance of DLN films on the nano- and macroscale. A technique of direct laser interference patterning was applied to produce arrays of periodic linear microstructures on the DLN films. The UV laser irradiation was performed at low fluences corresponding to the regime of surface graphitization and incipient ablation. At the initial stage of the thin film modification, the laser-induced spallation and graphitization in the surface layers were found to strongly influence the nanoscale topography and mechanical properties of the DLN surface. Frictional properties of the laser-patterned DLN films were studied using (1) atomic force microscopy in lateral force mode and (2) a ball-on-flat tribometer under linear reciprocating sliding against a 100Cr6 steel ball. The lateral force microscopy measurements revealed that the laser-irradiated regions were characterized by increased friction forces due to microspallation effects and enhanced surface roughness, correlating with tribotests at the initial stage of sliding. During prolonged sliding in ambient air, both the original and laser-patterned DLN surfaces exhibited low-friction performance at the friction coefficient of 0.07-0.08.

  4. Increase in the temperature of a laser plasma formed by two-frequency UV - IR irradiation of metal targets

    International Nuclear Information System (INIS)

    Antipov, A A; Grasyuk, Arkadii Z; Efimovskii, S V; Kurbasov, Sergei V; Losev, Leonid L; Soskov, V I

    1998-01-01

    An experimental investigation was made of a laser plasma formed by successive irradiation of a metal target with 30-ps UV and IR laser pulses. The UV prepulse, of 266 nm wavelength, was of relatively low intensity (∼ 10 12 W cm -2 ), whereas the intensity of an IR pulse, of 10.6 μm wavelength, was considerably higher (∼3 x 10 14 W cm -2 ) and it was delayed by 0 - 6 ns (the optimal delay was 2 ns). Such two-frequency UV - IR irradiation produced a laser plasma with an electron temperature 5 times higher than that of a plasma created by singe-frequency IR pulses of the same (∼3 x 10 14 W cm -2 ) intensity. (interaction of laser radiation with matter. laser plasma)

  5. What's behind the mask? A look at blood flow changes with prolonged facial pressure and expression using laser Doppler imaging.

    Science.gov (United States)

    Van-Buendia, Lan B; Allely, Rebekah R; Lassiter, Ronald; Weinand, Christian; Jordan, Marion H; Jeng, James C

    2010-01-01

    Clinically, the initial blanching in burn scar seen on transparent plastic face mask application seems to diminish with time and movement requiring mask alteration. To date, studies quantifying perfusion with prolonged mask use do not exist. This study used laser Doppler imaging (LDI) to assess perfusion through the transparent face mask and movement in subjects with and without burn over time. Five subjects fitted with transparent face masks were scanned with the LDI on four occasions. The four subjects without burn were scanned in the following manner: 1) no mask, 2) mask on while at rest, 3) mask on with alternating intervals of sustained facial expression and rest, and 4) after mask removal. Images were acquired every 3 minutes throughout the 85-minute study period. The subject with burn underwent a shortened scanning protocol to increase comfort. Each face was divided into five regions of interest for analysis. Compared with baseline, mask application decreased perfusion significantly in all subjects (P mask removal, all regions of the face demonstrated a hyperemic effect with the chin (P = .05) and each cheek (P mask removal. Perfusions remain constantly low while wearing the face mask, despite changing facial expressions. Changing facial expressions with the mask on did not alter perfusion. Hyperemic response occurs on removal of the mask. This study exposed methodology and statistical issues worth considering when conducting future research with the face, pressure therapy, and with LDI technology.

  6. Low-level laser irradiation protects the chick embryo chorioallantoic membrane from UV cytotoxicity

    Directory of Open Access Journals (Sweden)

    Hammami Amira

    2018-01-01

    Full Text Available Low-level laser therapy or photobiomodulation is the medical use of a very low intensity light in the red to near infrared (wavelengths in the range of 630-940 nm. The present work was conducted to explore the effects of both UV and low-level laser irradiation (LLLI on microcirculation using the in vivo model of the chick embryo chorioallantoic membrane (CAM. The effects were assessed by measuring lipid peroxidation and antioxidant enzyme activity. Cell cytotoxicity, survival and intracellular reactive oxygen species (ROS of the CAM were also evaluated. We found that UV irradiation induced alterations of the vessels, leading to bleeding and extravasation. This effect was intensified after 60 min of exposure to UV irradiation, leading to marked edema. UVA irradiation increased cell cytotoxicity as assessed by lactate dehydrogenase (LDH release (56.23% of control and reduced cell viability as assessed by decreased fluorescein diacetate (FDA fluorescence (56.23% of control. Pretreatment with LLLI prior to UV exposure protected the CAM tissue from UV-mediated cell death. This protective effect was supported by the observation of significantly inhibited lipid peroxidation (from 0.3±0.004 for UV, to 0.177±0.012 after LLLI pretreatment, ROS and O2 -production, as indicated by respective dihydrorhodamine (DHR and dihydroethidium (DHE intensities (from 132.78% of control for UVA, to 95.90% of control for L-UV (DHR, and from 127.34% of control for UVA, to 82.03% of control for L-UV (DHE, and by preventing the increase in oxidative activities. LLLI efficiently protected CAM cells from UV-induced oxidative stress and appeared as a safe protective pretreatment against UV irradiation.

  7. Digital selective growth of a ZnO nanowire array by large scale laser decomposition of zinc acetate.

    Science.gov (United States)

    Hong, Sukjoon; Yeo, Junyeob; Manorotkul, Wanit; Kang, Hyun Wook; Lee, Jinhwan; Han, Seungyong; Rho, Yoonsoo; Suh, Young Duk; Sung, Hyung Jin; Ko, Seung Hwan

    2013-05-07

    We develop a digital direct writing method for ZnO NW micro-patterned growth on a large scale by selective laser decomposition of zinc acetate. For ZnO NW growth, by replacing the bulk heating with the scanning focused laser as a fully digital local heat source, zinc acetate crystallites can be selectively activated as a ZnO seed pattern to grow ZnO nanowires locally on a larger area. Together with the selective laser sintering process of metal nanoparticles, more than 10,000 UV sensors have been demonstrated on a 4 cm × 4 cm glass substrate to develop all-solution processible, all-laser mask-less digital fabrication of electronic devices including active layer and metal electrodes without any conventional vacuum deposition, photolithographic process, premade mask, high temperature and vacuum environment.

  8. Application of the UV laser printing technique to soft gelatin capsules containing titanium dioxide in the shells.

    Science.gov (United States)

    Hosokawa, Akihiro; Kato, Yoshiteru

    2012-03-01

    The purpose of this study was to examine application of ultraviolet (UV) laser irradiation to printing soft gelatin capsules containing titanium dioxide (TiO(2)) in the shells and to study effect of UV laser power on the color strength of printing on the soft gelatin capsules. Size 6 Oval type soft gelatin capsules of which shells contained 0.685% TiO(2) and 0.005% ferric dioxide were used in this study. The capsules were irradiated pulsed UV laser at a wavelength 355 nm. The color strength of the printed capsules was determined by a spectrophotometer as total color difference (dE). The soft gelatin capsules which contained TiO(2) in the shells could be printed gray by the laser. Many black particles, which were associated with the printing, were formed at the colored parts of the shells. It was found that there were two inflection points in relationship between output laser energy of a pulse and dE. Below the lower point, the capsules were not printed. From the lower point to the upper point, the capsules were printed gray and total color difference of the printing increased linearly in proportion with the output laser energy. Beyond the upper point, total color difference showed saturation because of micro-bubbles formation at the laser irradiated spot. Soft gelatin capsules containing TiO(2) in the shells could be performed stable printing using the UV laser printing technique. Color strength of the printing could be controlled by regulating the laser energy between the two inflection points.

  9. Pulsed laser facilities operating from UV to IR at the Gas Laser Lab of the Lebedev Institute

    Science.gov (United States)

    Ionin, Andrei; Kholin, Igor; Vasil'Ev, Boris; Zvorykin, Vladimir

    2003-05-01

    Pulsed laser facilities developed at the Gas Lasers Lab of the Lebedev Physics Institute and their applications for different laser-matter interactions are discussed. The lasers operating from UV to mid-IR spectral region are as follows: e-beam pumped KrF laser (λ= 0.248 μm) with output energy 100 J; e-beam sustained discharge CO2(10.6 μm) and fundamental band CO (5-6 μm) lasers with output energy up to ~1 kJ; overtone CO laser (2.5-4.2 μm) with output energy ~ 50 J and N2O laser (10.9 μm) with output energy of 100 J; optically pumped NH3 laser (11-14 μm). Special attention is paid to an e-beam sustained discharge Ar-Xe laser (1.73 μm ~ 100 J) as a potential candidate for a laser-propulsion facility. The high energy laser facilities are used for interaction of laser radiation with polymer materials, metals, graphite, rocks, etc.

  10. Polarisation Control of DFB Fibre Laser Using UV-Induced Birefringent Phase-Shift

    DEFF Research Database (Denmark)

    Philipsen, Jacob Lundgreen; Lauridsen, Vibeke Claudia; Berendt, Martin Ole

    1998-01-01

    The polarisation properties of a distributed feedback (DFB) fibre laser are investigated experimentally. A birefringent phase-shift is induced by side illumination of the centre part of the lasing structure with ultraviolet (UV) light and it is experimentally shown that the birefringence...... of the phase-shift is the dominating effect controlling the polarisation properties of the laser....

  11. Propagation profile of ablation front driven by a nonuniform UV laser beam

    International Nuclear Information System (INIS)

    Matsushima, I.; Tanimoto, M.; Kasai, T.; Yano, M.

    1985-01-01

    Spatial profile of ablation front is observed under the irradiation of spatially modulated 0.27-μm laser beam. Propagation depth of the ablation front is derived by means of various methods which detect x-ray radiation from aluminum substrates overcoated with polyethylene layers of different thicknesses. A higher mass ablation rate is observed for the UV laser than the longer wavelength lasers. However, observation with an x-ray television camera shows that the spatial nonuniformity in the laser beam is projected on the ablation front surface without substantial smoothing

  12. Laser separation of nitrogen isotopes by the IR+UV dissociation of ammonia molecules

    International Nuclear Information System (INIS)

    Apatin, V M; Klimin, S A; Laptev, V B; Lokhman, V N; Ogurok, D D; Pigul'skii, S V; Ryabov, E A

    2008-01-01

    The separation of nitrogen isotopes is studied upon successive single-photon IR excitation and UV dissociation of ammonia molecules. The excitation selectivity was provided by tuning a CO 2 laser to resonance with 14 NH 3 molecules [the 9R(30) laser line] or with 15 NH 3 molecules [the 9R(10) laser line]. Isotopic mixtures containing 4.8% and 0.37% (natural content) of the 15 NH isotope were investigated. The dependences of the selectivity and the dissociation yield for each isotopic component on the buffer gas pressure (N 2 , O 2 , Ar) and the ammonia pressure were obtained. In the limit of low NH 3 pressures (0.5-2 Torr), the dissociation selectivity α(15/14) for 15 N was 17. The selectivity mechanism of the IR+UV dissociation is discussed and the outlook is considered for the development of the nitrogen isotope separation process based on this approach. (laser isotope separation)

  13. UV laser engraving of high temperature polymeric materials

    International Nuclear Information System (INIS)

    Martinez, D.; Laude, L.D.; Kolev, K.; Hanus, F.

    1999-01-01

    Among emerging technologies, those associated with laser sources as surface processing tools are quite promising. In the present work, a UV pulsed (excimer) laser source is experimented for engraving (or ablating) polymeric materials based on three high temperature polymers: polyethylene terephtalate (PET), polyethersulfone (PES) and polyphenylene sulfide (PPS). The ablation phenomenon is demonstrated on all these polymers and evaluated by stylus profilometry upon varying the laser fluence at impact. For each polymer, results give evidence for three characteristic quantities: an ablation threshold E sub 0, a maximum ablation depth per pulse z sub 0 and an initial rate of ablation α, just above threshold. A simple ablation model is presented which describes correctly the observed behaviours and associates closely the above quantities to the polymer formulation, thus providing for the first time a rational basis to polymer ablation. The model may be extended to parent plastic materials whenever containing the same polymers. It may also be used to predict the behaviours of other polymers when subjected to excimer laser irradiation

  14. Studies on the mechanism of printing film-coated tablets containing titanium dioxide in the film by using UV laser irradiation.

    Science.gov (United States)

    Kato, Yoshiteru; Nakashima, Yasuhiko; Shino, Naoki; Sasaki, Koichi; Hosokawa, Akihiro; Ishihara, Hiroshi

    2010-04-01

    The purpose of this article is to study a detailed mechanism of printing when film-coated tablets were irradiated by UV laser at a wavelength of 355 nm. Hydroxypropylmethylcellulose (HPMC) film containing titanium dioxide (TiO(2)) and the film not containing TiO(2) and TiO(2) powder were lirradiated by the UV laser and estimated by the morphological observation by zoom stereo microscope, thermogravimetric analysis (TGA), total color difference (dE), X-ray powder diffraction (XRD), and dispersive Raman microscopy. In the case of the film containing TiO(2), the film showed a visible change in its color from white to gray by the UV laser irradiation. By zoom stereo microscope, it was found that the entire UV laser-irradiated area was not grayed uniformly, but many black particles, whose diameter was about 2 microm, were observed on the film. When TiO(2) powder was irradiated by the UV laser, a visible change in its color from white to gray was observed similar to the case of the film containing TiO(2). There were many black particles locally in the UV laser-treated TiO(2) powder by the morphological observation, and these black particles, agglomerates of the grayed oxygen-defected TiO(2), were associated with the visible change of the TiO(2). It was found that the film-coated tablets were printed utilizing the formation of the black particles by the agglomeration of the grayed oxygen-defected TiO(2) by the UV laser irradiation.

  15. Laser ablation of toluene liquid for surface micro-structuring of silica glass

    International Nuclear Information System (INIS)

    Niino, H.; Kawaguchi, Y.; Sato, T.; Narazaki, A.; Gumpenberger, T.; Kurosaki, R.

    2006-01-01

    Microstructures with well-defined micropatterns were fabricated on the surfaces of silica glass using a laser-induced backside wet etching (LIBWE) method by diode-pumped solid state (DPSS) UV laser at the repetition rate of 10 kHz. For a demonstration of flexible rapid prototyping as mask-less exposure system, the focused laser beam was directed to the sample by galvanometer-based point scanning system. Additionally, a diagnostics study of plume propagation in the ablated products of toluene solid film was carried out with an intensified CCD (ICCD) camera

  16. UV laser beam profile measurement by means of the photoelectric effect on the wires of a proportional chamber

    International Nuclear Information System (INIS)

    Prokoviev, O.; Seiler, P.G.

    1989-01-01

    A simple technique to measure the profiles of pulsed UV laser beams is described. Irradiating a cathode wire of a proportional chamber with UV laser shots results in signals from the anode wire whose amplitudes are proportional to the UV light intensity. Profile scanning is performed by shifting the chamber across the beam. The chamber can also be used with reversed polarities. This leads to avalanches developing outwardly from the signal wire. In this case we observe a quadratic dependence of the pulse height on the UV light intensity. (orig.)

  17. 3D printed facial laser scans for the production of localised radiotherapy treatment masks - A case study.

    Science.gov (United States)

    Briggs, Matthew; Clements, Helen; Wynne, Neil; Rennie, Allan; Kellett, Darren

    This study investigates the use of 3D printing for patients that require localised radiotherapy treatment to the face. The current process involves producing a lead mask in order to protect the healthy tissue from the effects of the radiotherapy. The mask is produced by applying a thermoplastic sheet to the patient's face and allowing to set hard. This can then be used as a mould to create a plaster impression of the patient's face. A sheet of lead is then hammered on to the plaster to create a bespoke fitted face mask. This process can be distressing for patients and can be problematic when the patient is required to remain motionless for a prolonged time while the thermoplastic sets. In this study, a 1:1 scale 3D print of a patient's face was generated using a laser scanner. The lead was hammered directly on to the surface of the 3D print in order to create a bespoke fitted treatment mask. This eliminated the thermoplastic moulding stage and significantly reduced the time needed for the patient to be in clinic. The higher definition impression of the the face resulted in a more accurate, better fitting treatment mask.

  18. Masked Photocathode for Photoinjector

    International Nuclear Information System (INIS)

    Qiang, Ji

    2010-01-01

    In this research note, we propose a scheme to insert a photocathode inside a photoinjector for generating high brightness electron beam. Instead of mounting the photocathode onto the electrode, a masked electrode with small hole is used to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material very simple by rotating the photocathode behind the mask into the hole. This will significantly increase the usage lifetime of a photocathode. Furthermore, this also helps reduce the dark current or secondary electron emission from the photocathode. The hole on the mask also provides a transverse cut-off to the Gaussian laser profile which can be beneficial from the beam dynamics point of view.

  19. Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics.

    Science.gov (United States)

    Huang, Jin; Wang, Fengrui; Liu, Hongjie; Geng, Feng; Jiang, Xiaodong; Sun, Laixi; Ye, Xin; Li, Qingzhi; Wu, Weidong; Zheng, Wanguo; Sun, Dunlu

    2017-11-24

    The surface laser damage performance of fused silica optics is related to the distribution of surface defects. In this study, we used chemical etching assisted by ultrasound and magnetorheological finishing to modify defect distribution in a fused silica surface, resulting in fused silica samples with different laser damage performance. Non-destructive test methods such as UV laser-induced fluorescence imaging and photo-thermal deflection were used to characterize the surface defects that contribute to the absorption of UV laser radiation. Our results indicate that the two methods can quantitatively distinguish differences in the distribution of absorptive defects in fused silica samples subjected to different post-processing steps. The percentage of fluorescence defects and the weak absorption coefficient were strongly related to the damage threshold and damage density of fused silica optics, as confirmed by the correlation curves built from statistical analysis of experimental data. The results show that non-destructive evaluation methods such as laser-induced fluorescence and photo-thermal absorption can be effectively applied to estimate the damage performance of fused silica optics at 351 nm pulse laser radiation. This indirect evaluation method is effective for laser damage performance assessment of fused silica optics prior to utilization.

  20. Laser profiling of 3D microturbine blades

    Science.gov (United States)

    Holmes, Andrew S.; Heaton, Mark E.; Hong, Guodong; Pullen, Keith R.; Rumsby, Phil T.

    2003-11-01

    We have used KrF excimer laser ablation in the fabrication of a novel MEMS power conversion device based on an axial-flow turbine with an integral axial-flux electromagnetic generator. The device has a sandwich structure, comprising a pair of silicon stators either side of an SU8 polymer rotor. The curved turbine rotor blades were fabricated by projection ablation of SU8 parts performed by conventional UV lithography. A variable aperture mask, implemented by stepping a moving aperture in front of a fixed one, was used to achieve the desired spatial variation in the ablated depth. An automatic process was set up on a commercial laser workstation, with the laser firing and mask motion being controlled by computer. High quality SU8 rotor parts with diameters of 13 mm and depths of 1 mm were produced at a fluence of 0.7 J/cm2, corresponding to a material removal rate of approximately 0.3 μm per pulse. A similar approach was used to form SU8 guide vane inserts for the stators.

  1. Production of High Intracavity UV Power From a CW Laser Source

    Science.gov (United States)

    David, R. T.; Chyba, T. H.; Keppel, C. E.; Gaskell, D.; Ent, R.

    1998-01-01

    The goal of this research project is to create a prototype high power CW source of ultraviolet (UV) photons for photon-electron scattering at the Thomas Jefferson National Accelerator Facility (TJNAF), Hall B. The facility will use optical resonant cavities to produce a high photon flux. The technical approach will be to frequency-double the 514.5 mn light from an Argon-Ion Laser to create 0.1 to 1.0 watt in the UV. The produced UV power will be stored in a resonant cavity to generate an high intracavity UV power of 102 to 103 watts. The specific aim of this project is to first design and construct the low-Q doubling cavity and lock it to the Argon-Ion wavelength. Secondly, the existing 514.5 nm high-Q build-up cavity and its locking electronics will be modified to create high intracavity UV power. The entire system will then be characterized and evaluated for possible beam line use.

  2. UV laser radiation alters the embryonic protein profile of adrenal-kidney-gonadal complex and gonadal differentiation in the lizard, Calotes Versicolor.

    Science.gov (United States)

    Khodnapur, Bharati S; Inamdar, Laxmi S; Nindi, Robertraj S; Math, Shivkumar A; Mulimani, B G; Inamdar, Sanjeev R

    2015-02-01

    To examine the impact of ultraviolet (UV) laser radiation on the embryos of Calotes versicolor in terms of its effects on the protein profile of the adrenal-kidney-gonadal complex (AKG), sex determination and differentiation, embryonic development and hatching synchrony. The eggs of C. versicolor, during thermo-sensitive period (TSP), were exposed to third harmonic laser pulses at 355 nm from a Q-switched Nd:YAG laser for 180 sec. Subsequent to the exposure they were incubated at the male-producing temperature (MPT) of 25.5 ± 0.5°C. The AKG of hatchlings was subjected to protein analysis by sodium dodecyl sulphate-polyacrylamide gel electrophoresis (SDS-PAGE) and to histology. The UV laser radiation altered the expression of the protein banding pattern in the AKG complex of hatchlings and it also affected the gonadal sex differentiation. SDS-PAGE of AKG of one-day-old hatchlings revealed a total of nine protein bands in the control group whereas UV laser irradiated hatchlings expressed a total of seven protein bands only one of which had the same Rf as a control band. The UV laser treated hatchlings have an ovotestes kind of gonad exhibiting a tendency towards femaleness instead of the typical testes. It is inferred that 355 nm UV laser radiation during TSP induces changes in the expression of proteins as well as their secretions. UV laser radiation had an impact on the gonadal differentiation pathway but no morphological anomalies were noticed.

  3. Imprinting on empty hard gelatin capsule shells containing titanium dioxide by application of the UV laser printing technique.

    Science.gov (United States)

    Hosokawa, Akihiro; Kato, Yoshiteru; Terada, Katsuhide

    2014-08-01

    The purpose of this study was to examine the application of ultraviolet (UV) laser irradiation to printing hard gelatin capsule shells containing titanium dioxide (TiO2) and to clarify how the color strength of the printing by the laser could be controlled by the power of the irradiated laser. Hard gelatin capsule shells containing 3.5% TiO2 were used in this study. The capsules were irradiated with pulsed UV laser at a wavelength of 355 nm. The color strength of the printed capsule was determined by a spectrophotometer as total color difference (dE). The capsules could be printed gray by the UV laser. The formation of many black particles which were agglomerates of oxygen-defected TiO2 was associated with the printing. In the relationship between laser peak power of a pulse and dE, there were two inflection points. The lower point was the minimal laser peak power to form the black particles and was constant regardless of the dosage forms, for example film-coated tablets, soft gelatin capsules and hard gelatin capsules. The upper point was the minimal laser peak power to form micro-bubbles in the shells and was variable with the formulation. From the lower point to the upper point, the capsules were printed gray and the dE of the printing increased linearly with the laser peak power. Hard gelatin capsule shells containing TiO2 could be printed gray using the UV laser printing technique. The color strength of the printing could be controlled by regulating the laser energy between the two inflection points.

  4. Identification of novel direct protein-protein interactions by irradiating living cells with femtosecond UV laser pulses.

    Science.gov (United States)

    Itri, Francesco; Monti, Daria Maria; Chino, Marco; Vinciguerra, Roberto; Altucci, Carlo; Lombardi, Angela; Piccoli, Renata; Birolo, Leila; Arciello, Angela

    2017-10-07

    The identification of protein-protein interaction networks in living cells is becoming increasingly fundamental to elucidate main biological processes and to understand disease molecular bases on a system-wide level. We recently described a method (LUCK, Laser UV Cross-linKing) to cross-link interacting protein surfaces in living cells by UV laser irradiation. By using this innovative methodology, that does not require any protein modification or cell engineering, here we demonstrate that, upon UV laser irradiation of HeLa cells, a direct interaction between GAPDH and alpha-enolase was "frozen" by a cross-linking event. We validated the occurrence of this direct interaction by co-immunoprecipitation and Immuno-FRET analyses. This represents a proof of principle of the LUCK capability to reveal direct protein interactions in their physiological environment. Copyright © 2017 Elsevier Inc. All rights reserved.

  5. Ferromagnetic shadow mask for spray coating of polymer patterns

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Bosco, Filippo; Boisen, Anja

    2013-01-01

    We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties of the sha......We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties...

  6. Mask fabrication process

    Science.gov (United States)

    Cardinale, Gregory F.

    2000-01-01

    A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.

  7. Low-Temperature Rapid Fabrication of ZnO Nanowire UV Sensor Array by Laser-Induced Local Hydrothermal Growth

    Directory of Open Access Journals (Sweden)

    Sukjoon Hong

    2013-01-01

    Full Text Available We demonstrate ZnO nanowire based UV sensor by laser-induced hydrothermal growth of ZnO nanowire. By inducing a localized temperature rise using focused laser, ZnO nanowire array at ~15 μm size consists of individual nanowires with ~8 μm length and 200~400 nm diameter is readily synthesized on gold electrode within 30 min at the desired position. The laser-induced growth process is consecutively applied on two different points to bridge the micron gap between the electrodes. The resultant photoconductive ZnO NW interconnections display 2~3 orders increase in the current upon the UV exposure at a fixed voltage bias. It is also confirmed that the amount of photocurrent can be easily adjusted by changing the number of ZnO NW array junctions. The device exhibits clear response to the repeated UV illumination, suggesting that this process can be usefully applied for the facile fabrication of low-cost UV sensor array.

  8. Coumarin-BODIPY hybrids by heteroatom linkage: versatile, tunable and photostable dye lasers for UV irradiation.

    Science.gov (United States)

    Esnal, I; Duran-Sampedro, G; Agarrabeitia, A R; Bañuelos, J; García-Moreno, I; Macías, M A; Peña-Cabrera, E; López-Arbeloa, I; de la Moya, S; Ortiz, M J

    2015-03-28

    Linking amino and hydroxycoumarins to BODIPYs through the amino or hydroxyl group lets the easy construction of unprecedented photostable coumarin-BODIPY hybrids with broadened and enhanced absorption in the UV spectral region, and outstanding wavelength-tunable laser action within the green-to-red spectral region (∼520-680 nm). These laser dyes allow the generation of a valuable tunable UV (∼260-350 nm) laser source by frequency doubling, which is essential to study accurately the photochemistry of biological molecules under solar irradiation. The tunability is achieved by selecting the substitution pattern of the hybrid. Key factors are the linking heteroatom (nitrogen vs. oxygen), the number of coumarin units joined to the BODIPY framework and the involved linking positions.

  9. Low cost, patterning of human hNT brain cells on parylene-C with UV & IR laser machining.

    Science.gov (United States)

    Raos, Brad J; Unsworth, C P; Costa, J L; Rohde, C A; Doyle, C S; Delivopoulos, E; Murray, A F; Dickinson, M E; Simpson, M C; Graham, E S; Bunting, A S

    2013-01-01

    This paper describes the use of 800nm femtosecond infrared (IR) and 248nm nanosecond ultraviolet (UV) laser radiation in performing ablative micromachining of parylene-C on SiO2 substrates for the patterning of human hNT astrocytes. Results are presented that support the validity of using IR laser ablative micromachining for patterning human hNT astrocytes cells while UV laser radiation produces photo-oxidation of the parylene-C and destroys cell patterning. The findings demonstrate how IR laser ablative micromachining of parylene-C on SiO2 substrates can offer a low cost, accessible alternative for rapid prototyping, high yield cell patterning.

  10. Compact and portable multiline UV and visible Raman lasers in hydrogen-filled HC-PCF.

    Science.gov (United States)

    Wang, Y Y; Couny, F; Light, P S; Mangan, B J; Benabid, F

    2010-04-15

    We report on the realization of compact UV visible multiline Raman lasers based on two types of hydrogen-filled hollow-core photonic crystal fiber. The first, with a large pitch Kagome lattice structure, offers a broad spectral coverage from near IR through to the much sought after yellow, deep-blue and UV, whereas the other, based on photonic bandgap guidance, presents a pump conversion concentrated in the visible region. The high Raman efficiency achieved through these fibers allows for compact, portable diode-pumped solid-state lasers to be used as pumps. Each discrete component of this laser system exhibits a spectral density several orders of magnitude larger than what is achieved with supercontinuum sources and a narrow linewidth, making it an ideal candidate for forensics and biomedical applications.

  11. Transverse UV-laser irradiation-induced defects and absorption in a single-mode erbium-doped optical fiber

    International Nuclear Information System (INIS)

    Tortech, B.; Ouerdane, Y.; Boukenter, A.; Meunier, J. P.; Girard, S.; Van Uffelen, M.; Berghmans, F.; Regnier, E.; Berghmans, F.; Thienpont, H.

    2009-01-01

    Near UV-visible absorption coefficients of an erbium-doped optical fiber were investigated through an original technique based on a transverse cw UV-laser irradiation operating at 244 nm. Such irradiation leads to the generation of a quite intense guided luminescence signal in near UV spectral range. This photoluminescence probe source combined with a longitudinal translation of the fiber sample (at a constant velocity) along the UV-laser irradiation, presents several major advantages: (i) we bypass and avoid the procedures classically used to study the radiation induced attenuation which are not adapted to our case mainly because the samples present a very strong absorption with significant difficulties due to the injection of adequate UV-light levels in a small fiber diameter: (ii) the influence of the laser irradiation on the host matrix of the optical fiber is directly correlated to the evolution of the generated photoluminescence signal and (iii) in our experimental conditions, short fiber sample lengths (typically 20-30 cm) suffice to determine the associated absorption coefficients over the entire studied spectral domain. The generated photoluminescence signal is also used to characterize the absorption of the erbium ions in the same wavelength range with no cut-back method needed. (authors)

  12. High energy, high average power solid state green or UV laser

    Science.gov (United States)

    Hackel, Lloyd A.; Norton, Mary; Dane, C. Brent

    2004-03-02

    A system for producing a green or UV output beam for illuminating a large area with relatively high beam fluence. A Nd:glass laser produces a near-infrared output by means of an oscillator that generates a high quality but low power output and then multi-pass through and amplification in a zig-zag slab amplifier and wavefront correction in a phase conjugator at the midway point of the multi-pass amplification. The green or UV output is generated by means of conversion crystals that follow final propagation through the zig-zag slab amplifier.

  13. A vacuum-UV laser-induced fluorescence experiment for measurement of rotationally and vibrationally excited H2

    NARCIS (Netherlands)

    Vankan, P.J.W.; Heil, S.B.S.; Mazouffre, S.; Engeln, R.A.H.; Schram, D.C.; Döbele, H.F.

    2004-01-01

    An experimental setup is built to detect spatially resolved rovibrationally excited hydrogen molecules via laser-induced fluorescence. To excite the hydrogen molecules, laser radiation is produced in the vacuum UV part of the spectrum. The laser radiation is tunable between 120 nm and 230 nm and has

  14. P 8: Table-top instrumentation for time-resolved luminescence spectroscopy of solids excited by soft X-ray from a laser induced plasma source and/or UV-VIS laser

    International Nuclear Information System (INIS)

    Bruza, P.; Fidler, V.; Nikl, M.

    2010-01-01

    The design and use of a novel, table-top UV-VIS luminescence spectrometer with two excitation sources is described: a soft X-ray/XUV pulse excitation from the laser-produced plasma in gas puff target of about 4 ns duration, and a conventional N 2 pulse laser excitation at 337 nm (or any other UV-VIS pulse laser excitation). The XUV plasma source generates photons of either quasi-monochromatic (N target, E = 430 eV) or wide (Ar target, E = 200 ∼ 600 eV) spectral range. A combination of both X-ray/XUV and UV-VIS excitation in one experimental apparatus allows to perform comparative luminescence spectra and kinetics measurements under the same experimental conditions. In order to demonstrate the spectrometer, the UV-VIS luminescence spectra and decay kinetics of cerium doped Lu 3 Al 5 O 12 single crystal (LuAG:Ce) scintillator excited by XUV and UV radiation were acquired. Luminescence of doped Ce 3+ ions was studied under XUV 430 eV excitation from the laser-produced nitrogen plasma, and compared with the luminescence under 337 nm (3,68 eV) UV excitation from nitrogen laser. In the former case the excitation energy is deposited in the LuAG host, while in the latter the 4f-5d transition of Ce 3+ is directly excited. Furthermore, LuAG:Ce single crystals and single crystalline films luminescence decay profiles are compared and discussed. (authors)

  15. Tunable Direct Writing of FBGs into a Non-Photosensitive Tm-Doped Fiber Core with an fs Laser and Phase Mask

    International Nuclear Information System (INIS)

    Cheng-Wei, Song; Yang, Wang; Yun-Jun, Zhang; You-Lun, Ju

    2009-01-01

    Fiber Bragg gratings (FBGs) are successfully written in a non-photosensitive Tm-doped single-mode fiber by a 800 nm fs laser and a 2.7 μm period phase mask. The intra-core FBGs are written using the phase mask ±1 order interference, and have a period of 1.35 μm, which responds to the second-order reflective central wavelength at 1946.4 nm. Based on the magnification tuning writing technology, the tunable writing technology is also experimentally investigated. The distance between the phase mask and the fiber, between the phase mask and the tuning lens, and the focal length of the tuning lens all have an influence on the tunable characteristics. Four different FBGs tuning refiective central wavelengths located at 1958.7 nm, 1970.8 nm, 1882.5 nm and 1899.7 nm are obtained

  16. Thermal transport measurements of uv laser irradiated spherical targets

    International Nuclear Information System (INIS)

    Jaanimagi, P.A.; Delettrez, J.; Henke, B.L.; Richardson, M.C.

    1985-01-01

    New measurements are presented of thermal transport in spherical geometry using time-resolved x-ray spectroscopy. We determine the time dependence of the mass ablation rate m(dot) by following the progress of the ablation surface through thin layers of material embedded at various depths below the surface of the target. These measurements made with 6 and 12 uv (351 nm) beams from OMEGA are compared to previous thermal transport data and are in qualitative agreement with detailed LILAC hydrodynamic code simulations which predict a sharp decrease in m(dot) after the peak of the laser pulse. Non-uniform laser irradiation of the target results in the anomalously high values of m(dot) measured in these experiments

  17. Investigation of room temperature UV emission of ZnO films with different defect densities induced by laser irradiation.

    Science.gov (United States)

    Zhao, Yan; Jiang, Yijian

    2010-08-01

    We studied the room temperature UV emission of ZnO films with different defect densities which is fabricated by KrF laser irradiation process. It is shown room temperature UV photoluminescence of ZnO film is composed of contribution from free-exciton (FX) recombination and its longitudinal-optical phonon replica (FX-LO) (1LO, 2LO). With increase of the defect density, the FX emission decreased and FX-LO emission increased dramatically; and the relative strengths of FX to FX-LO emission intensities determine the peak position and intensity of UV emission. What is more, laser irradiation with moderate energy density could induce the crystalline ZnO film with very flat and smooth surface. This investigation indicates that KrF laser irradiation could effectively modulate the exciton emission and surface morphology, which is important for the application of high performance of UV emitting optoelectronic devices. Copyright 2010 Elsevier B.V. All rights reserved.

  18. Generation of 275.4-nm UV output from a large-frame argon-ion laser for fluorescence detection in capillary electrophoresis.

    NARCIS (Netherlands)

    Kok, S.J.; de Ridder, T.; Brinkman, U.A.T.; Velthorst, N.H.; Gooijer, C.; Hoornweg, G.Ph.

    1998-01-01

    A standard, relatively old, large-frame argon-ion laser, which is available in many laboratories, was modified to produce output in the deep- UV (275-306 nm) region by installing a set of inexpensive, commercially available laser mirrors. The deep-UV output is generally applicable as excitation

  19. Cryogenic-laser-fusion target implosion studies performed with the OMEGA uv-laser system

    International Nuclear Information System (INIS)

    Marshall, F.J.; Letzring, S.A.; Verdon, C.P.; Skupsky, S.; Keck, R.L.; Knauer, J.P.; Kremens, R.L.; Bradley, D.K.; Kessler, T.; Delettrez, J.; and others.

    1989-01-01

    A series of direct-drive laser-fusion implosion experiments was performed on cryogenically cooled, DT-filled glass microballoons with the OMEGA 24-beam uv (351-nm) laser system. The targets consisted of glass microballoons having radii of 100 to 150 μm, wall thicknesses of 3 to 7 μm, filled with DT gas at pressures of 75 to 100 atm. The targets were cooled to below the freezing point of DT, in situ, by a cryogenic target system. The targets were irradiated by approximately 1 to 1.2 kJ of uv light in 650-ps Gaussian pulses. The on-target irradiation uniformity was enhanced for these experiments by the use of distributed phase plates, which brought the estimated irradiation nonuniformities to ∼12% (σ rms ). Target performance was diagnosed by an array of x-ray, plasma, and nuclear instruments. The measured target performance showed ∼70% absorption, thermonuclear yields of 10 6 to 10 8 neutrons, and final fuel areal densities of 20 to 40 mg/cm 2 for the optimum targets examined in these experiments. Fuel densities at the time of thermonuclear neutron production, inferred from direct measurements of the fuel areal density, were in the range of 20 to 50 g/cm 3 (100 to 200 times the density of liquid DT) for the optimum targets

  20. Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:H

    Energy Technology Data Exchange (ETDEWEB)

    Molpeceres, C. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain)], E-mail: carlos.molpeceres@upm.es; Lauzurica, S.; Garcia-Ballesteros, J.J.; Morales, M.; Guadano, G.; Ocana, J.L. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain); Fernandez, S.; Gandia, J.J. [Dept. de Energias Renovables, Energia Solar Fotovoltaica, CIEMAT, Avda, Complutense 22, 28040 Madrid (Spain); Villar, F.; Nos, O.; Bertomeu, J. [CeRMAE Dept. Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, 08028 Barcelona (Spain)

    2009-03-15

    Lasers are essential tools for cell isolation and monolithic interconnection in thin-film-silicon photovoltaic technologies. Laser ablation of transparent conductive oxides (TCOs), amorphous silicon structures and back contact removal are standard processes in industry for monolithic device interconnection. However, material ablation with minimum debris and small heat affected zone is one of the main difficulty is to achieve, to reduce costs and to improve device efficiency. In this paper we present recent results in laser ablation of photovoltaic materials using excimer and UV wavelengths of diode-pumped solid-state (DPSS) laser sources. We discuss results concerning UV ablation of different TCO and thin-film silicon (a-Si:H and nc-Si:H), focussing our study on ablation threshold measurements and process-quality assessment using advanced optical microscopy techniques. In that way we show the advantages of using UV wavelengths for minimizing the characteristic material thermal affection of laser irradiation in the ns regime at higher wavelengths. Additionally we include preliminary results of selective ablation of film on film structures irradiating from the film side (direct writing configuration) including the problem of selective ablation of ZnO films on a-Si:H layers. In that way we demonstrate the potential use of UV wavelengths of fully commercial laser sources as an alternative to standard backscribing process in device fabrication.

  1. Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:H

    International Nuclear Information System (INIS)

    Molpeceres, C.; Lauzurica, S.; Garcia-Ballesteros, J.J.; Morales, M.; Guadano, G.; Ocana, J.L.; Fernandez, S.; Gandia, J.J.; Villar, F.; Nos, O.; Bertomeu, J.

    2009-01-01

    Lasers are essential tools for cell isolation and monolithic interconnection in thin-film-silicon photovoltaic technologies. Laser ablation of transparent conductive oxides (TCOs), amorphous silicon structures and back contact removal are standard processes in industry for monolithic device interconnection. However, material ablation with minimum debris and small heat affected zone is one of the main difficulty is to achieve, to reduce costs and to improve device efficiency. In this paper we present recent results in laser ablation of photovoltaic materials using excimer and UV wavelengths of diode-pumped solid-state (DPSS) laser sources. We discuss results concerning UV ablation of different TCO and thin-film silicon (a-Si:H and nc-Si:H), focussing our study on ablation threshold measurements and process-quality assessment using advanced optical microscopy techniques. In that way we show the advantages of using UV wavelengths for minimizing the characteristic material thermal affection of laser irradiation in the ns regime at higher wavelengths. Additionally we include preliminary results of selective ablation of film on film structures irradiating from the film side (direct writing configuration) including the problem of selective ablation of ZnO films on a-Si:H layers. In that way we demonstrate the potential use of UV wavelengths of fully commercial laser sources as an alternative to standard backscribing process in device fabrication.

  2. Pulsed UV laser-induced modifications in optical and structural characteristics of alpha-irradiated PM-355 SSNTD.

    Science.gov (United States)

    Alghamdi, S S; Farooq, W A; Baig, M R; Algarawi, M S; Alrashidi, Talal Mohammed; Ali, Syed Mansoor; Alfaramawi, K

    2017-10-01

    Pre- and postalpha-exposed PM-355 detectors were irradiated using UV laser with different number of pulses (100, 150, 200, 300, and 400). UV laser beam energy of 20mJ per pulse with a pulse width of 9ns was incident on an area of 19.6mm 2 of the samples. XRD spectra indicated that for both reference and UV-irradiated samples, the structure is amorphous, but the crystallite size increases upon UV irradiation. The same results were obtained from SEM analysis. Optical properties of PM-355 polymeric solid-state nuclear track detectors were also investigated. Absorbance measurements for all PM-355 samples in the range of 200-400nm showed that the absorption edge had a blue shift up to a certain value, and then, it had an oscillating behavior. Photoluminescence spectra of PM-355 at 250nm revealed a decrease in the broadband peak intensity as a function of the number of UV pulses, while the wavelengths corresponding to the peaks had random shifts. Copyright © 2017 Elsevier Ltd. All rights reserved.

  3. Visible laser and UV-A radiation impact on a PNP degrading Moraxella strain and its rpoS mutant.

    Science.gov (United States)

    Nandakumar, Kanavillil; Keeler, Werden; Schraft, Heidi; Leung, Kam T

    2006-07-05

    The role of stationary phase sigma factor gene (rpoS) in the stress response of Moraxella strain when exposed to radiation was determined by comparing the stress responses of the wild-type (WT) and its rpoS knockout (KO) mutant. The rpoS was turned on by starving the WT cultures for 24 h in minimal salt medium. Under non-starved condition, both WT and KO planktonic Moraxella cells showed an increase in mortality with the increase in duration of irradiation. In the planktonic non-starved Moraxella, for the power intensity tested, UV radiation caused a substantially higher mortality rate than did by the visible laser light (the mortality rate observed for 15-min laser radiation was 53.4 +/- 10.5 and 48.7 +/- 8.9 for WT and KO, respectively, and 97.6 +/- 0 and 98.5 +/- 0 for 25 s of UV irradiation in WT and KO, respectively). However, the mortality rate decreased significantly in the starved WT when exposed to these two radiations. In comparison, rpoS protected the WT against the visible laser light more effectively than it did for the UV radiation. The WT and KO strains of Moraxella formed distinctly different types of biofilms on stainless steel coupons. The KO strain formed a denser biofilm than did the WT. Visible laser light removed biofilms from the surfaces more effectively than did the UV. This was true when comparing the mortality of bacteria in the biofilms as well. The inability of UV radiation to penetrate biofilms due to greater rates of surface absorption is considered to be the major reason for the weaker removal of biofilms in comparison to that of the visible laser light. This result suggests that high power visible laser light might be an effective tool for the removal of biofilms. (c) 2006 Wiley Periodicals, Inc.

  4. Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

    Science.gov (United States)

    Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

    2018-06-01

    The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

  5. Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

    Science.gov (United States)

    Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

    2018-04-01

    The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

  6. Thermal Effect on a CIGS Thin-Film Solar Cell P2 Layer by Using a UV Laser

    Directory of Open Access Journals (Sweden)

    Dyi-Cheng Chen

    2014-07-01

    Full Text Available This study used ANSYS simulation software for analyzing an ultraviolet (UV (355 nm laser processing system. The laser apparatus was used in a stainless steel CIGS solar cell P2 layer for simulation analysis. CIGS films process order according to SiO2 layer, molybdenum electrode, CIGS absorbed layer, CdS buffered layer, i-ZnO penetrate light layer, TCO front electrode, MgF resist reflected materials, andelectrode materials. The simulation and experimental results were compared to obtain a laser-delineated P2 laser with a low melting and vaporization temperature. According to the simulation results, the laser function time was 135 μs, the UV laser was 0.5 W, and the P2 layer thin films were removed. The experimental results indicated that the electrode pattern of the experiment was similar to that of the simulation result, and the laser process did not damage the base plate. The analysis results confirm that the laser apparatus is effective when applied to a stainless steel CIGS solar cell P2 layer.

  7. Development of highly qualified UV-laser light source for rf gun

    International Nuclear Information System (INIS)

    Tomizawa, H.; Dewa, H.; Taniuchi, T.

    2004-01-01

    We have been developing stable and highly qualified UV-laser pulse as a light source of the rf gun for an injector candidate of future light sources. Our gun cavity is a single-cell pillbox, and the copper inner wall is used as a photo cathode. In present status, the short pulse energy stability of laser has been improved down to 1.3∼1.5% (rms; 10pps; 10000 shots) at the third harmonic generation. The long stability depends on the stability of modelocking at oscillator. In this improvement we just passively stabilized the system. We considered environmental controls in clean room to reduce optical damage accidents and constructed a new humidity-controlled clean room in 2003. And we re-installed the total laser system in this room in 2004. The relative humidity of this new clean room at room temperature is in a region of 50∼60 % with a stability of less than 2% (p-p). On the other hand, the ideal spatial and temporal profiles of a shot-by-shot single laser pulse are essential to suppress the emittance growth of the electron beam from a photo-cathode rf gun. This laser-shaping project has been started in two steps since 2002. As the first successful test run in 2002, with a microlens array as a simple spatial shaper, we obtained a minimum emittance value of 2π mm·mrad with a beam energy of 3.1 MeV, holding its charge to 0.1 nC/bunch. In the next test run in 2004, we prepared a deformable mirror for spatial shaping, and a spatial light modulator based on fused-silica plates for temporal shaping. We are applying the both adaptive optics to automatically shape the both spatial and temporal UV-laser profiles with a feedback routine at the same time. We report herein the principle and developing process of our laser beam quality control system. (author)

  8. A UV pre-ionized dual-wavelength short-pulse high-power CO{sub 2} laser facility for laser particle acceleration research

    Energy Technology Data Exchange (ETDEWEB)

    Ebrahim, N A; Mouris, J F; Davis, R W

    1994-12-01

    In this report we describe the Chalk River dual-wavelength, short-pulse, single-mode, high-power CO{sub 2} laser facility for research in laser particle acceleration and CANDU materials modifications. The facility is designed and built around UV-preionized transversely-excited atmospheric-pressure (TEA) Lumonics CO{sub 2} laser discharge modules. Peak focussed power densities of up to 2 x 10{sup 14} W/cm{sup 2} in 500 ps pulses have been obtained. (author). 10 refs., 9 figs.

  9. Spatially selective Au nanoparticle growth in laser-quality glass controlled by UV-induced phosphate-chain cross-linkage

    International Nuclear Information System (INIS)

    Sigaev, Vladimir N; Savinkov, Vitaly I; Lotarev, Sergey V; Shakhgildyan, Georgiy Yu; Paleari, Alberto; Lorenzi, Roberto

    2013-01-01

    Herein we describe how UV excitation of localized electronic states in phosphate glasses can activate structural rearrangements that influence the kinetics of Au nanoparticle (NP) thermal growth in Au-doped glass. The results suggest a novel strategy to address the problem of controlling nano-assembly processes of metal NP patterns in fully inorganic and chemically stable hard materials, such as laser-quality glasses. We show that the mechanism is promoted by opening and subsequent cross-linkage of phosphate chains under UV excitation of non-bridging groups in the amorphous network of the glass, with a consequent modification of Au diffusion and metal NP growth. Importantly, the micro-Raman mapping of the UV-induced modifications demonstrates that the process is restricted within the beam waist region of the focused UV laser beam. This fact is consistent with the need for more than one excitation event, close in time and in space, in order to promote structural cross-linkage and Au diffusion confinement. The stability of the photo-induced modifications makes it possible to design new metal patterning approaches for the fabrication of three-dimensional metal structures in laser-quality materials for high-power nonlinear applications. (paper)

  10. Spatially selective Au nanoparticle growth in laser-quality glass controlled by UV-induced phosphate-chain cross-linkage.

    Science.gov (United States)

    Sigaev, Vladimir N; Savinkov, Vitaly I; Lotarev, Sergey V; Shakhgildyan, Georgiy Yu; Lorenzi, Roberto; Paleari, Alberto

    2013-06-07

    Herein we describe how UV excitation of localized electronic states in phosphate glasses can activate structural rearrangements that influence the kinetics of Au nanoparticle (NP) thermal growth in Au-doped glass. The results suggest a novel strategy to address the problem of controlling nano-assembly processes of metal NP patterns in fully inorganic and chemically stable hard materials, such as laser-quality glasses. We show that the mechanism is promoted by opening and subsequent cross-linkage of phosphate chains under UV excitation of non-bridging groups in the amorphous network of the glass, with a consequent modification of Au diffusion and metal NP growth. Importantly, the micro-Raman mapping of the UV-induced modifications demonstrates that the process is restricted within the beam waist region of the focused UV laser beam. This fact is consistent with the need for more than one excitation event, close in time and in space, in order to promote structural cross-linkage and Au diffusion confinement. The stability of the photo-induced modifications makes it possible to design new metal patterning approaches for the fabrication of three-dimensional metal structures in laser-quality materials for high-power nonlinear applications.

  11. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  12. Production of high-power CW UV by resonant frequency quadrupling of a Nd:YLF laser

    International Nuclear Information System (INIS)

    Kuczewski, A.J.; Thorn, C.E.

    1999-01-01

    The authors have constructed a single ring to resonantly double an 18 watt Nd:YLF mode-locked laser and re-double the stored green to produce over 4 watts of power in the ultra-violet (UV). This laser is used to produce a beam of 470 MeV gamma-rays by Compton backscattering the laser beam from 2.8 GeV electrons stored in a synchrotron. Achieving high luminosity of the colliding beams requires very good mode quality and beam stability at the intersection point 22 meters from the laser. The ring consists of six mirrors, with two 25 cm radius of curvature mirrors enclosing each nonlinear crystal. The drive laser is a lamp-pumped Nd:YLF with a 50 ps bunch length at 76 MHz. A pointing stabilizer servo has been constructed as part of the infrared (IR) mode matching telescope. The IR to green conversion is accomplished in a 15 mm long non-critically phased matched LBO crystal located at a 40 micron waist, with an IR conversion efficiency of 70%. A stable, nearly diffraction limited UV beam of up to 4.2 watts is generated in a BBO crystal in the green storage ring. The output power is relatively independent of the efficiency of the LBO and BBO crystals. This fact makes it possible to reduce the amount of non-TEM 00 modes created by walk-off of the UV by using relatively thin BBO crystals. At present, however, the lower bound on the BBO thickness is limited by the loss of conversion efficiency at high power

  13. The UV and Laser Aging for PMMA/BDK/Azo-dye Polymer Blend Cured by UV Light Beams

    International Nuclear Information System (INIS)

    Ahmad, A A; Omari, A M

    2015-01-01

    A polymeric-based solution blend composed of Azo-dye methyl red (MR) doped with polymethelmethacrelate (PMMA) solution, in addition, to the BenzylDimethylKetal (BDK) photoinitiator was made with optimum molar ratios and deposited on glass substrate by spin coating technique. The samples were then exposed to UV light beams in order to assist the layers polymerization by the proper exposure process. The photo chemical reaction occurred during the UV light polymerization process induces photo refractive changes which were presented as a function of wavelength or photon energy. Two main strong absorption peaks were observed in the films at around 330 nm (3.75 eV) and 500 nm (2.48 eV) for different curing time periods. This phenomenon enhances the films usage for optical data storage media at these two wavelengths. Since the deposited films were then useful as based layers for Read/Write optical data storage media, they were then tested by UV or laser Read/Write beams independently. The optical properties of the films were investigated while exposed to each beam. Finally, their optical properties were investigated as a function of aging time in order to relate the temporary and/or permanent light-exposure effect on the films compared to their optical properties before the light exposure. The films show a low absorbance at 630 nm (1.97 eV) and high absorbance at 480 nm (2.58 eV). This fact makes it possible to record holographic gratings in the polymeric film upon light exposure. In all cases the optical properties were evaluated by using the very sensitive, non destructive surface testing spectroscopic ellipsometry technique. The films were characterized in the spectral range of 300 to 1000 nm using Lorentz oscillator model with one oscillator centred at 4.15 eV. This study has been supported by the SEM and EDAX results to investigate the effect of the UV and visible beams on their optical properties. The results of this research determined the proper conditions for

  14. IR Laser-Induced Thermolysis and UV Laser-Induced Photolysis of 1,3-Diethyldisiloxane: Chemical Vapour Deposition of Nanotextured Hydridoalkylsilicones

    Czech Academy of Sciences Publication Activity Database

    Urbanová, Markéta; Bastl, Zdeněk; Šubrt, Jan; Pola, Josef

    2001-01-01

    Roč. 11, č. 6 (2001), s. 1557-1562 ISSN 0959-9428 R&D Projects: GA AV ČR IAA4072806 Keywords : thermolysis * UV laser photolysis * composition Subject RIV: CH - Nuclear ; Quantum Chemistry Impact factor: 2.736, year: 2001

  15. A new nanosecond UV laser at 355 nm: early results of corneal flap cutting in a rabbit model.

    Science.gov (United States)

    Trost, Andrea; Schrödl, Falk; Strohmaier, Clemens; Bogner, Barbara; Runge, Christian; Kaser-Eichberger, Alexandra; Krefft, Karolina; Vogel, Alfred; Linz, Norbert; Freidank, Sebastian; Hilpert, Andrea; Zimmermann, Inge; Grabner, Günther; Reitsamer, Herbert A

    2013-12-03

    A new 355 nm UV laser was used for corneal flap cutting in an animal model and tested for clinical and morphologic alterations. Corneal flaps were created (Chinchilla Bastards; n = 25) with an UV nanosecond laser at 355 nm (150 kHz, pulse duration 850 ps, spot-size 1 μm, spot spacing 6 × 6 μm, side cut Δz 1 μm; cutting depth 130 μm) and pulse energies of 2.2 or 2.5 μJ, respectively. Following slit-lamp examination, animals were killed at 6, 12, and 24 hours after treatment. Corneas were prepared for histology (hematoxylin and eosin [HE], TUNEL-assay) and evaluated statistically, followed by ultrastructural investigations. Laser treatment was tolerated well, flap lift was easier at 2.5 μJ compared with 2.2 μJ. Standard HE at 24 hours revealed intact epithelium in the horizontal cut, with similar increase in corneal thickness at both energies. Irrespective of energy levels, TUNEL assay revealed comparable numbers of apoptotic cells in the horizontal and vertical cut at 6, 12, and 24 hours, becoming detectable in the horizontal cut as an acellular stromal band at 24 hours. Ultrastructural analysis revealed regular morphology in the epi- and endothelium, while in the stroma, disorganized collagen lamellae were detectable representing the horizontal cut, again irrespective of energy levels applied. This new UV laser revealed no epi- nor endothelial damage at energies feasible for corneal flap cutting. Observed corneal swelling was lower compared with existing UV laser studies, albeit total energy applied here was much higher. Observed loss of stromal keratinocytes is comparable with available laser systems. Therefore, this new laser is suitable for refractive surgery, awaiting its test in a chronic environment.

  16. Analysis of oxide formation induced by UV laser coloration of stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Li, Z.L., E-mail: zlli@SIMTech.a-star.edu.sg [Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075 (Singapore); Zheng, H.Y.; Teh, K.M.; Liu, Y.C.; Lim, G.C. [Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075 (Singapore); Seng, H.L.; Yakovlev, N.L. [Institute of Materials Research and Engineering, 3 Research Link, 117602 (Singapore)

    2009-12-15

    Laser-induced coloration on metal surfaces has important applications in product identification, enhancing styles and aesthetics. The color generation is the result of controlled surface oxidation during laser beam interaction with the metal surfaces. In this study, we aim to obtain in-depth understanding of the oxide formation process when an UV laser beam interacts with stainless steel in air. The oxide layer is analysed by means of optical microscopy, scanning electron microscopy (SEM) and time-of-flight secondary ion mass spectrometer (TOF-SIMS). TOF-SIMS results clearly show the formation of duplex oxide structures. The duplex structure includes an inner layer of Cr oxide solution and an outer layer of Fe oxide solution. The oxide layer thickness increased as the results of Fe diffusion to surface during multiple laser scanning passes.

  17. Analysis of oxide formation induced by UV laser coloration of stainless steel

    International Nuclear Information System (INIS)

    Li, Z.L.; Zheng, H.Y.; Teh, K.M.; Liu, Y.C.; Lim, G.C.; Seng, H.L.; Yakovlev, N.L.

    2009-01-01

    Laser-induced coloration on metal surfaces has important applications in product identification, enhancing styles and aesthetics. The color generation is the result of controlled surface oxidation during laser beam interaction with the metal surfaces. In this study, we aim to obtain in-depth understanding of the oxide formation process when an UV laser beam interacts with stainless steel in air. The oxide layer is analysed by means of optical microscopy, scanning electron microscopy (SEM) and time-of-flight secondary ion mass spectrometer (TOF-SIMS). TOF-SIMS results clearly show the formation of duplex oxide structures. The duplex structure includes an inner layer of Cr oxide solution and an outer layer of Fe oxide solution. The oxide layer thickness increased as the results of Fe diffusion to surface during multiple laser scanning passes.

  18. Selective cell culture on UV transparent polymer by F2 laser surface modification

    International Nuclear Information System (INIS)

    Hanada, Yasutaka; Sugioka, Koji; Kawano, Hiroyuki; Tsuchimoto, Takayoshi; Miyamoto, Iwao; Miyawaki, Atsushi; Midorikawa, Katsumi

    2009-01-01

    A microchip made of UV transparent polymer (CYTOP) that can perform selective cell culture has been fabricated by F 2 laser surface modification. The refractive index of CYTOP is almost the same as that of culture medium, which is essential for three-dimensional (3D) observation of cells. The F 2 laser modification of CYTOP achieves hydrophilicity only on the laser irradiated area with little deterioration of the optical properties and surface smoothness. After the laser modification, HeLa cells were successfully cultured and strongly adhered only on the modified area of CYTOP. The cells patterned on CYTOP were applied for clear 3D observation using an optical microscope in phase contrast mode.

  19. Formation of quasi-periodic nano- and microstructures on silicon surface under IR and UV femtosecond laser pulses

    International Nuclear Information System (INIS)

    Ionin, Andrei A; Golosov, E V; Kolobov, Yu R; Kudryashov, Sergei I; Ligachev, A E; Makarov, Sergei V; Novoselov, Yurii N; Seleznev, L V; Sinitsyn, D V

    2011-01-01

    Quasi-periodic nano- and microstructures have been formed on silicon surface using IR ( λ ≈ 744 nm) and UV ( λ ≈ 248 nm) femtosecond laser pulses. The influence of the incident energy density and the number of pulses on the structured surface topology has been investigated. The silicon nanostructurisation thresholds have been determined for the above-mentioned wavelengths. Modulation of the surface relief at the doubled spatial frequency is revealed and explained qualitatively. The periods of the nanostructures formed on the silicon surface under IR and UV femtosecond laser pulses are comparatively analysed and discussed.

  20. UV laser incorporation of dopants in silicon: comparison of two processes

    International Nuclear Information System (INIS)

    Fogarassy, E.P.; Narayan, J.; Lowndes, D.H.; White, C.H.

    1985-01-01

    The rapid deposition of pulsed-laser energy into the near-surface region of silicon leads to melting of crystal, followed by liquid phase epitaxial regrowth from the underlying substrate at a growth velocity of several meters per second. During rapid solidification, implanted or deposited group III and V impurities can be incorporated into substitutional sites in the silicon lattice with concentrations far in excess of their equilibrium solubility limit. The authors have investigated and compared the incorporation of implanted or deposited antimony into the silicon lattice during laser annealing with a pulsed KrF UV laser (lambda = 0.249 μm, Z = 35 ns). The surface melting dynamics resulting from laser irradiation have been studied by time-resolved reflectivity. In the two cases, the sharp transition to the high reflectivity phase (R = 72%, at lambda = 0.633 μm of the HeNe laser probe) is characteristic of molten silicon. Surface melt durations measured on implanted Sb (150 KeV, 5 x 10 16 cm -2 ) and deposited Sb (80 A thick on crystalline silicon) are significantly larger than those for virgin silicon

  1. Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy.

    Science.gov (United States)

    Lin, Jingquan; Weber, Nils; Escher, Matthias; Maul, Jochen; Han, Hak-Seung; Merkel, Michael; Wurm, Stefan; Schönhense, Gerd; Kleineberg, Ulf

    2008-09-29

    A photoemission electron microscope based on a new contrast mechanism "interference contrast" is applied to characterize extreme ultraviolet lithography mask blank defects. Inspection results show that positioning of interference destructive condition (node of standing wave field) on surface of multilayer in the local region of a phase defect is necessary to obtain best visibility of the defect on mask blank. A comparative experiment reveals superiority of the interference contrast photoemission electron microscope (Extreme UV illumination) over a topographic contrast one (UV illumination with Hg discharge lamp) in detecting extreme ultraviolet mask blank phase defects. A depth-resolved detection of a mask blank defect, either by measuring anti-node peak shift in the EUV-PEEM image under varying inspection wavelength condition or by counting interference fringes with a fixed illumination wavelength, is discussed.

  2. Laser direct writing of thin-film copper structures as a modification of lithographic processes

    International Nuclear Information System (INIS)

    Meyer, F; Ostendorf, A; Stute, U

    2007-01-01

    This paper presents a flexible, mask-free and efficient technique for UV-laser micropatterning of photosensitive resist by laser direct writing (LDW). Photo resist spun on gold sputtered silicon wafers has been laser structured by a scanner guided 266nm DPSSL and electroplated. Ablation behaviour and optimum seed layer preparation in relation to parameters like pulse energy, scanning speed and number of scanned cycles and the electroplating results are discussed. The resulting adhesive strength was measured by a μ-sear device and the gold seed layer-plated copper interface investigated by SEM and EDX to explain correlation to identified bonding behaviour. Improved adhesive strength was observed with higher laser pulse energy and reduced number of cycle

  3. UV excimer laser and low temperature plasma treatments of polyamide materials

    Science.gov (United States)

    Yip, Yiu Wan Joanne

    Polyamides have found widespread application in various industrial sectors, for example, they are used in apparel, home furnishings and similar uses. However, the requirements for high quality performance products are continually increasing and these promote a variety of surface treatments for polymer modification. UV excimer laser and low temperature plasma treatments are ideally suited for polyamide modification because they can change the physical and chemical properties of the material without affecting its bulk features. This project aimed to study the modification of polyamides by UV excimer laser irradiation and low temperature plasma treatment. The morphological changes in the resulting samples were analysed by scanning electron microscopy (SEM) and tapping mode atomic force microscopy (TM-AFM). The chemical modifications were studied by x-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and chemical force microscopy (CFM). Change in degree of crystallinity was examined by differential scanning calorimetry (DSC). After high-fluence laser irradiation, topographical results showed that ripples of micrometer size form on the fibre surface. By contrast, sub-micrometer size structures form on the polyamide surface when the applied laser energy is well below its ablation threshold. After high-fluence laser irradiation, chemical studies showed that the surface oxygen content of polyamide is reduced. A reverse result is obtained with low-fluence treatment. The DSC result showed no significant change in degree of crystallinity in either high-fluence or low-fluence treated samples. The same modifications in polyamide surfaces were studied after low temperature plasma treatment with oxygen, argon or tetrafluoromethane gas. The most significant result was that the surface oxygen content of polyamide increased after oxygen and argon plasma treatments. Both treatments induced many hydroxyl (-OH) and carboxylic acid (-COOH

  4. Micromachining and dicing of sapphire, gallium nitride and micro LED devices with UV copper vapour laser

    International Nuclear Information System (INIS)

    Gu, E.; Jeon, C.W.; Choi, H.W.; Rice, G.; Dawson, M.D.; Illy, E.K.; Knowles, M.R.H.

    2004-01-01

    Gallium nitride (GaN) and sapphire are important materials for fabricating photonic devices such as high brightness light emitting diodes (LEDs). These materials are strongly resistant to wet chemical etching and also, low etch rates restrict the use of dry etching. Thus, to develop alternative high resolution processing and machining techniques for these materials is important in fabricating novel photonic devices. In this work, a repetitively pulsed UV copper vapour laser (255 nm) has been used to machine and dice sapphire, GaN and micro LED devices. Machining parameters were optimised so as to achieve controllable machining and high resolution. For sapphire, well-defined grooves 30 μm wide and 430 μm deep were machined. For GaN, precision features such as holes on a tens of micron length scale have been fabricated. By using this technique, compact micro LED chips with a die spacing 100 and a 430 μm thick sapphire substrate have been successfully diced. Measurements show that the performances of LED devices are not influenced by the UV laser machining. Our results demonstrate that the pulsed UV copper vapour laser is a powerful tool for micromachining and dicing of photonic materials and devices

  5. On the multiphoton emission during U.V. and X-ray absorption by atoms in intense laser fields

    International Nuclear Information System (INIS)

    Miranda, L.C.M.

    1981-09-01

    A discussion of the u.v. and x-ray absorption cross section by a hydrogen atom in the presence of an intense i.r. laser field is presented, taking into account the influence of laser field on the electronic states. (Author) [pt

  6. Flame Characterization Using a Tunable Solid-State Laser with Direct UV Pumping

    Science.gov (United States)

    Kamal, Mohammed M.; Dubinskii, Mark A.; Misra, Prabhakar

    1996-01-01

    Tunable solid-state lasers with direct UV pumping, based on d-f transitions of rare earth ions incorporated in wide band-gap dielectric crystals, are reliable sources of laser radiation that are suitable for excitation of combustion-related free radicals. We have employed such a laser for analytical flame characterization utilizing Laser-Induced Fluorescence (LIF) techniques. LIF spectra of alkane-air flames (used for studying combustion processes under normal and microgravity conditions) excited in the region of the A-X (0,0) OH-absorption band have been recorded and found to be both temperature-sensitive and positionally-sensitive. In addition, also clearly noticeable was the sensitivity of the spectra to the specific wavelength used for data registration. The LiCAF:Ce laser shows good prospects for being able to cover the spectral region between 280 and 340 nm and therefore be used excitation of combustion-intermediates such as the hydroxyl OH, methoxy CH30 and methylthio CH3S radicals.

  7. Damage-free laser patterning of silicon nitride on textured crystalline silicon using an amorphous silicon etch mask for Ni/Cu plated silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Bailly, Mark S., E-mail: mbailly@asu.edu; Karas, Joseph; Jain, Harsh; Dauksher, William J.; Bowden, Stuart

    2016-08-01

    We investigate the optimization of laser ablation with a femtosecond laser for direct and indirect removal of SiN{sub x} on alkaline textured c-Si. Our proposed resist-free indirect removal process uses an a-Si:H etch mask and is demonstrated to have a drastically improved surface quality of the laser processed areas when compared to our direct removal process. Scanning electron microscope images of ablated sites show the existence of substantial surface defects for the standard direct removal process, and the reduction of those defects with our proposed process. Opening of SiN{sub x} and SiO{sub x} passivating layers with laser ablation is a promising alternative to the standard screen print and fire process for making contact to Si solar cells. The potential for small contacts from laser openings of dielectrics coupled with the selective deposition of metal from light induced plating allows for high-aspect-ratio metal contacts for front grid metallization. The minimization of defects generated in this process would serve to enhance the performance of the device and provides the motivation for our work. - Highlights: • Direct laser removal of silicon nitride (SiN{sub x}) damages textured silicon. • Direct laser removal of amorphous silicon (a-Si) does not damage textured silicon. • a-Si can be used as a laser patterned etch mask for SiN{sub x}. • Chemically patterned SiN{sub x} sites allow for Ni/Cu plating.

  8. UV reactor flow visualization and mixing quantification using three-dimensional laser-induced fluorescence.

    Science.gov (United States)

    Gandhi, Varun; Roberts, Philip J W; Stoesser, Thorsten; Wright, Harold; Kim, Jae-Hong

    2011-07-01

    Three-dimensional laser-induced fluorescence (3DLIF) was applied to visualize and quantitatively analyze mixing in a lab-scale UV reactor consisting of one lamp sleeve placed perpendicular to flow. The recirculation zone and the von Karman vortex shedding that commonly occur in flows around bluff bodies were successfully visualized. Multiple flow paths were analyzed by injecting the dye at various heights with respect to the lamp sleeve. A major difference in these pathways was the amount of dye that traveled close to the sleeve, i.e., a zone of higher residence time and higher UV exposure. Paths away from the center height had higher velocities and hence minimal influence by the presence of sleeve. Approach length was also characterized in order to increase the probability of microbes entering the region around the UV lamp. The 3DLIF technique developed in this study is expected to provide new insight on UV dose delivery useful for the design and optimization of UV reactors. Copyright © 2011 Elsevier Ltd. All rights reserved.

  9. Phase-shifted Bragg grating inscription in PMMA microstructured POF using 248 nm UV radiation

    DEFF Research Database (Denmark)

    Pereira, L.; Pospori, A.; Antunes, Paulo

    2017-01-01

    In this work we experimentally validate and characterize the first phase-shifted polymer optical fiber Bragg gratings (PS-POFBGs) produced using a single pulse from a 248 nm krypton fluoride laser. A single-mode poly (methyl methacrylate) optical fiber with a core doped with benzyl dimethyl ketal...... for photosensitivity improvement was used. A uniform phase mask customized for 850 nm grating inscription was used to inscribe these Bragg structures. The phase shift defect was created directly during the grating inscription process by placing a narrow blocking aperture in the center of the UV beam. The produced high...

  10. IR and UV laser-induced morphological changes in silicon surface under oxygen atmosphere

    Energy Technology Data Exchange (ETDEWEB)

    Jimenez-Jarquin, J.; Fernandez-Guasti, M.; Haro-Poniatowski, E.; Hernandez-Pozos, J.L. [Laboratorio de Optica Cuantica, Departamento de Fisica, Universidad Autonoma Metropolitana-Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340, Mexico D.F. (Mexico)

    2005-08-01

    We irradiated silicon (100) wafers with IR (1064 nm) and UV (355 nm) nanosecond laser pulses with energy densities within the ablation regime and used scanning electron microscopy to analyze the morphological changes induced on the Si surface. The changes in the wafer morphology depend both on the incident radiation wavelength and the environmental atmosphere. We have patterned Si surfaces with a single focused laser spot and, in doing the experiments with IR or UV this reveals significant differences in the initial surface cracking and pattern formation, however if the experiment is carried out in O{sub 2} the final result is an array of microcones. We also employed a random scanning technique to irradiate the silicon wafer over large areas, in this case the microstructure patterns consist of a ''semi-ordered'' array of micron-sized cones. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  11. Transverse effects in UV FELs

    International Nuclear Information System (INIS)

    Small, D.W.; Wong, R.K.; Colson, W.B.

    1995-01-01

    In an ultraviolet Free Electron Laser (UV FEL), the electron beam size can be approximately the same as the optical mode size. The performance of a UV FEL is studied including the effect of emittance, betatron focusing, and external focusing of the electron beam on the transverse optical mode. The results are applied to the Industrial Laser Consortium's UV FEL

  12. Properties of a novel radiophotoluminescent readout system using a cw modulated UV laser diode and phase-sensitive technique

    International Nuclear Information System (INIS)

    Zhao, C.; Kurobori, T.; Miyamoto, Y.; Yamamoto, T.

    2011-01-01

    We have proposed and constructed a novel readout system for measuring a dose-dependent radiophotoluminescence (RPL) signal of a silver-activated phosphate glass dosimeter. The present reader consists of a modulated continuous-wave (cw) ultraviolet (UV) laser diode at 375 nm as an excitation and a phase-sensitive technique using a lock-in amplifier. Preliminary results using a home-made reader are compared with those of the conventional technique based on a combination of a pulsed UV N 2 laser excitation at 337 nm and a photon counting system.

  13. Selective cell culture on UV transparent polymer by F{sub 2} laser surface modification

    Energy Technology Data Exchange (ETDEWEB)

    Hanada, Yasutaka, E-mail: y-hanada@riken.jp [RIKEN-Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan); Sugioka, Koji [RIKEN-Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan); Kawano, Hiroyuki [RIKEN-Brain Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan); Tsuchimoto, Takayoshi [RIKEN-Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan); Department of Applied Electronics, Faculty of Industrial Science and Technology Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510 (Japan); Miyamoto, Iwao [Department of Applied Electronics, Faculty of Industrial Science and Technology Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510 (Japan); Miyawaki, Atsushi [RIKEN-Brain Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan); Midorikawa, Katsumi [RIKEN-Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198 (Japan)

    2009-09-30

    A microchip made of UV transparent polymer (CYTOP) that can perform selective cell culture has been fabricated by F{sub 2} laser surface modification. The refractive index of CYTOP is almost the same as that of culture medium, which is essential for three-dimensional (3D) observation of cells. The F{sub 2} laser modification of CYTOP achieves hydrophilicity only on the laser irradiated area with little deterioration of the optical properties and surface smoothness. After the laser modification, HeLa cells were successfully cultured and strongly adhered only on the modified area of CYTOP. The cells patterned on CYTOP were applied for clear 3D observation using an optical microscope in phase contrast mode.

  14. Distribution and avoidance of debris on epoxy resin during UV ns-laser scanning processes

    Science.gov (United States)

    Veltrup, Markus; Lukasczyk, Thomas; Ihde, Jörg; Mayer, Bernd

    2018-05-01

    In this paper the distribution of debris generated by a nanosecond UV laser (248 nm) on epoxy resin and the prevention of the corresponding re-deposition effects by parameter selection for a ns-laser scanning process were investigated. In order to understand the mechanisms behind the debris generation, in-situ particle measurements were performed during laser treatment. These measurements enabled the determination of the ablation threshold of the epoxy resin as well as the particle density and size distribution in relation to the applied laser parameters. The experiments showed that it is possible to reduce debris on the surface with an adapted selection of pulse overlap with respect to laser fluence. A theoretical model for the parameter selection was developed and tested. Based on this model, the correct choice of laser parameters with reduced laser fluence resulted in a surface without any re-deposited micro-particles.

  15. High power uv metal vapor ion lasers pumped by thermal energy charge exchange

    International Nuclear Information System (INIS)

    Kan, T.

    1975-01-01

    The requirement for efficient and scalable laser sources for laser isotope separation (LIS) has recently been brought into sharp focus. The lack of suitable coherent sources is particularly severe in the uv, a spectral region of interest for more efficient and advanced isotope separation schemes. This report explores the general class of metal vapor ion lasers pumped by thermal energy charge exchange (TECX) as possible scalable coherent sources for LIS with the following potential characteristics: (1) availability of discrete wavelengths spanning the wavelength region between 2000 A less than lambda less than 8000 A, (2) pulsed or cw operation in the multi-kilowatt average power levels, (3) overall device efficiencies approaching one percent, and (4) the engineering of practical laser devices using relatively benign electron beam technology. (U.S.)

  16. Chromatin damage induced by fast neutrons or UV laser radiation

    Energy Technology Data Exchange (ETDEWEB)

    Radu, L.; Constantinescu, B.; Gazdaru, D.; Mihailescu, I

    2002-07-01

    Chromatin samples from livers of Wistar rats were subjected to fast neutron irradiation in doses of 10-100 Gy or to a 248 nm excimer laser radiation, in doses of 0.5-3 MJ.m{sup -2}. The action of the radiation on chromatin was monitored by chromatin intrinsic fluorescence and fluorescence lifetimes (of bound ethidium bromide to chromatin) and by analysing fluorescence resonance energy transfer between dansyl chloride and acridine orange coupled to chromatin. For the mentioned doses of UV excimer laser radiation, the action on chromatin was more intense than in the case of fast neutrons. The same types of damage are produced by the two radiations: acidic and basic destruction of chromatin protein structure, DNA strand breaking and the increase of the distance between DNA and proteins in chromatin. (author)

  17. Chromatin damage induced by fast neutrons or UV laser radiation

    International Nuclear Information System (INIS)

    Radu, L.; Constantinescu, B.; Gazdaru, D.; Mihailescu, I.

    2002-01-01

    Chromatin samples from livers of Wistar rats were subjected to fast neutron irradiation in doses of 10-100 Gy or to a 248 nm excimer laser radiation, in doses of 0.5-3 MJ.m -2 . The action of the radiation on chromatin was monitored by chromatin intrinsic fluorescence and fluorescence lifetimes (of bound ethidium bromide to chromatin) and by analysing fluorescence resonance energy transfer between dansyl chloride and acridine orange coupled to chromatin. For the mentioned doses of UV excimer laser radiation, the action on chromatin was more intense than in the case of fast neutrons. The same types of damage are produced by the two radiations: acidic and basic destruction of chromatin protein structure, DNA strand breaking and the increase of the distance between DNA and proteins in chromatin. (author)

  18. Low-Power Super-resolution Readout with Antimony Bismuth Alloy Film as Mask layer

    International Nuclear Information System (INIS)

    Lai-Xin, Jiang; Yi-Qun, Wu; Yang, Wang; Jing-Song, Wei; Fu-Xi, Gan

    2009-01-01

    Sb–Bi alloy films are proposed as a new kind of super-resolution mask layer with low readout threshold power. Using the Sb–Bi alloy film as a mask layer and SiN as a protective layer in a read-only memory disc, the super-resolution pits with diameters of 380 nm are read out by a dynamic setup, the laser wavelength is 780 nm and the numerical aperture of pickup lens is 0.45. The effects of the Sb–Bi thin film thickness, laser readout power and disc rotating velocity on the readout signal are investigated. The results show that the threshold laser power of super-resolution readout of the Sb–Bi mask layer is about 0.5 mW, and the corresponding carrier-to-noise ratio is about 20 dB at the film thickness of 50 nm. The super-resolution mechanism of the Sb–Bi alloy mask layer is discussed based on its temperature dependence of reflection

  19. Effect of psoralen and near UV on vertebrate cells in culture: comparison of laser with standard lamp

    International Nuclear Information System (INIS)

    Peterson, S.P.; Berns, M.W.

    1978-01-01

    4'-Aminoethyl-4,5',8-trimethylpsoralen, a DNA photoreagent, was used in conjunction with near UV light to modify cell growth and morphology. Since near UV radiation is needed to trigger the photoreactions, various doses of classical and laser near UV light were exposed to cells growing in media containing psoralen. It was found that near UV light caused a reduction in cell viability as indicated by complete inhibition of growth. The specificity of psoralens for nucleic acids was also investigated by using a tritium labeled psoralen derivative and tracing its appearance in different fractions of DNA from treated and untreated cells. (author)

  20. Effect of psoralen and near uv on vertebrate cells in culture: comparison of laser with standard lamp

    Energy Technology Data Exchange (ETDEWEB)

    Peterson, S P; Berns, M W [California Univ., Irvine (USA)

    1978-03-01

    4'-Aminoethyl-4,5',8-trimethylpsoralen, a DNA photoreagent, was used in conjunction with near uv light to modify cell growth and morphology. Since near uv radiation is needed to trigger the photoreactions, various doses of classical and laser near uv light were administerd to cells growing in media containing psoralen. It was found that near uv light caused a reduction in cell viability as indicated by complete inhibition of growth. The specificity of psoralens for nucleic acids was also investigated by using a tritium labeled psoralen derivative and tracing its appearance in different fractions of DNA from treated and untreated cells.

  1. The potential for optical beam shaping of UV laser sources for mass scale quarantine disinfection applications

    Science.gov (United States)

    Lizotte, Todd

    2010-08-01

    disinfection systems using high intensity UV laser sources instead of UV bulb techniques by using laser beam shaping optics in conjunction with traditional optical laser beam delivery techniques.

  2. A combination of He-Ne laser irradiation and exogenous NO application efficiently protect wheat seedling from oxidative stress caused by elevated UV-B stress.

    Science.gov (United States)

    Li, Yongfeng; Gao, Limei; Han, Rong

    2016-12-01

    The elevated ultraviolet-B (UV-B) stress induces the accumulation of a variety of intracellular reactive oxygen species (ROS), which seems to cause oxidative stress for plants. To date, very little work has been done to evaluate the biological effects of a combined treatment with He-Ne laser irradiation and exogenous nitric oxide (NO) application on oxidative stress resulting from UV-B radiation. Thus, our study investigated the effects of a combination with He-Ne laser irradiation and exogenous NO treatment on oxidative damages in wheat seedlings under elevated UV-B stress. Our data showed that the reductions in ROS levels, membrane damage parameters, while the increments in antioxidant contents and antioxidant enzyme activity caused by a combination with He-Ne laser and exogenous NO treatment were greater than those of each individual treatment. Furthermore, these treatments had a similar effect on transcriptional activities of plant antioxidant enzymes. This implied that the protective effects of a combination with He-Ne laser irradiation and exogenous NO treatment on oxidative stress resulting from UV-B radiation was more efficient than each individual treatment with He-Ne laser or NO molecule. Our findings might provide beneficial theoretical references for identifying some effective new pathways for plant UV-B protection.

  3. XPS investigations on the UV-laser ablation mechanism of poly(ether imide)

    Energy Technology Data Exchange (ETDEWEB)

    Wambach, J; Kunz, T; Schnyder, B; Koetz, R; Wokaun, A [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1999-08-01

    UV-Laser ablated samples of poly(ether imide) [Kapton{sup TM}] were studied with small-spot XPS. Applying fluences above the threshold level (0.167 J/cm{sup 2}) resulted in the expected behaviour of a decline of both nitrogen and oxygen. Below the threshold level a hint for an altered ablation mechanism was found. (author) 1 fig., 5 refs.

  4. Responses of He-Ne laser on agronomic traits and the crosstalk between UVR8 signaling and phytochrome B signaling pathway in Arabidopsis thaliana subjected to supplementary ultraviolet-B (UV-B) stress.

    Science.gov (United States)

    Gao, Limei; Li, Yongfeng; Shen, Zhihua; Han, Rong

    2018-05-01

    UV-B acclimation effects and UV-B damage repair induced by a 632.8-nm He-Ne laser were investigated in Arabidopsis thaliana plants in response to supplementary UV-B stress. There was an increasing trend in growth parameters in the combination-treated plants with He-Ne laser and UV-B light compared to those stressed with enhanced UV-B light alone during different developmental stages of plants. The photosynthetic efficiency (Pn) and survival rates of seedlings were significantly higher in the combination treatments than UV-B stress alone. The expression of UVR8, phytochrome B (PhyB), and their mediated signal responsive genes such as COP1, HY5, and CHS were also significantly upregulated in plants with the laser irradiation compared with other groups without the laser. Levels of flavonol accumulation in leaves and capsule yield of He-Ne laser-treated plants were increased. The phyB-9 mutants were more sensitive to enhanced UV-B stress and had no obvious improvements in plant phenotypic development and physiological damage caused by enhanced UV-B stress after He-Ne laser irradiation. Our results suggested that UVR8 and its mediated signaling pathway via interaction with COP1 can be induced by He-Ne laser, and these processes were dependent on cytoplasmic PhyB levels in plant cells, which might be one of the most important mechanisms of He-Ne laser on UV-B protection and UV-B damage repair. These current data have also elucidated that the biostimulatory effects of He-Ne laser on Arabidopsis thaliana plants would happen not only during the early growth stage but also during the entire late developmental stage.

  5. Uv Laser Excitation for Ultra-Sensitive Photoluminescent Dosimetry

    Energy Technology Data Exchange (ETDEWEB)

    Kastner, J.; Eggenberger, D.; Longnecker, A. [Argonne National Laboratory, Argonne, IL (United States); King, D.; Schutt, D. [Radiation Laboratory, University of Notre Dame, South Bend, IN (United States)

    1967-03-15

    The factor which has limited the sensitivity of photoluminescent dosimetry has been the ''pre-dose'' background which is stimulated during readout by the usual continuous ultra-violet (UV) exposure. The signal-to-noise ratio has only been partially optimized by the selective choice of filters and optical geometry. A microdosimetric system has been conceived and investigated which is potentially capable of sensing extremely low radiation doses (of the order of microrads). This system depends on the little-known fact that the decay time for the visible luminescence, which is a measure of the absorbed dose, is at least ten times longer than the decay of the indistinguishable visible fluorescence (to UV) which is an inherent characteristic of unexposed silver phosphate glasses. The system consists of UV, 3500A, laser beam, with a Pockels cell so that it has complete cut-off in intensity in the order of nanoseconds, and gating circuitry to open the visible light-sensing photomultiplier at a sufficient time delay to prevent it from sensing the ultra-violet or the pre-dose fluorescence which decays within the order of 100 nanoseconds. In this way the signal-to-noise ratio can be vastly improved upon that obtainable by optical means. With this system the authors were easily able to measure quantitatively one milliroentgen of cobalt-60 exposure. They are of the opinion that further improvement in this system should enable them to do track visualization and/or in vivo biological microdosimetry with a spatial resolution of the order of ten microns. (author)

  6. Damage caused by a nanosecond UV laser on a heated copper surface

    Energy Technology Data Exchange (ETDEWEB)

    Henč-Bartolić, V., E-mail: visnja.henc@fer.hr [University of Zagreb, Faculty of Electrical Engineering and Computing, Unska 3, 10000 Zagreb (Croatia); Bončina, T. [University of Maribor, Faculty of Mechanical Engineering, Smetanova 17, 2000 Maribor (Slovenia); Jakovljević, S., E-mail: suzana.jakovljevic@fsb.hr [University of Zagreb, Faculty of Mechanical Engineering and Naval Architecture, Ivana Lučića 5, 10002 Zagreb (Croatia); Panjan, P. [Jožef Stefan Institute, Jamova 39, 1000 Ljubljana (Slovenia); Zupanič, F. [University of Maribor, Faculty of Mechanical Engineering, Smetanova 17, 2000 Maribor (Slovenia)

    2016-08-15

    Highlights: • A Cu-plate was exposed to nanosecond UV laser with max. energy 1.1 J/cm{sup 2}. • Surface topography was studied on the cold and heated copper plate. • At room temperature, a crater formed, the melt was ejected from it. • Capillary waves formed in the vicinity of the crater at 360 °C. - Abstract: This work studied the effect of thin copper plate temperature on its surface morphology after irradiation using a pulsed nanosecond UV laser. The surface characteristics were investigated using scanning electron microscopy, energy dispersive X-ray spectroscopy, focused ion beam and stylus profilometry. When a target was at room temperature, a crater and the radial flow of molten Cu from the crater was observed. When the thin target was warm (about 360 °C ± 20 °C), a crater was smaller, and quasi-semicircular waves with the periodicity of around 3 μm appeared in its vicinity. The origin of the waves is Marangoni effect, causing thermocapillary waves, which in same occasions had a structure of final states of chaos in Rayleigh–Bénard convection.

  7. Universal liquid-phase laser fabrication of various nano-metals encapsulated by ultrathin carbon shells for deep-UV plasmonics.

    Science.gov (United States)

    Yu, Miao; Yang, Chao; Li, Xiao-Ming; Lei, Tian-Yu; Sun, Hao-Xuan; Dai, Li-Ping; Gu, Yu; Ning, Xue; Zhou, Ting; Wang, Chao; Zeng, Hai-Bo; Xiong, Jie

    2017-06-29

    The exploration of localized surface plasmon resonance (LSPR) beyond the usual visible waveband, for example within the ultraviolet (UV) or deep-ultraviolet (D-UV) regions, is of great significance due to its unique applications in secret communications and optics. However, it is still challenging to universally synthesize the corresponding metal nanostructures due to their high activity. Herein, we report a universal, eco-friendly, facile and rapid synthesis of various nano-metals encapsulated by ultrathin carbon shells, significantly with a remarkable deep-UV LSPR characteristic, via a liquid-phase laser fabrication method. Firstly, a new generation of the laser ablation in liquid (LAL) method has been developed with an emphasis on the elaborate selection of solvents to generate ultrathin carbon shells, and hence to stabilize the formed metal nanocrystals. As a result, a series of metal@carbon nanoparticles (NPs), including Cr@C, Ti@C, Fe@C, V@C, Al@C, Sn@C, Mn@C and Pd@C, can be fabricated by this modified LAL method. Interestingly, these NPs exhibit LSPR peaks in the range of 200-330 nm, which are very rare for localized surface plasmon resonance. Consequently, the UV plasmonic effects of these metal@carbon NPs were demonstrated both by the observed enhancement in UV photoluminescence (PL) from the carbon nanoshells and by the improvement of the photo-responsivity of UV GaN photodetectors. This work could provide a universal method for carbon shelled metal NPs and expand plasmonics into the D-UV waveband.

  8. Effect of laser UV radiation on the eye scleral tissue in patients with open-angle glaucoma

    Science.gov (United States)

    Razhev, A. M.; Iskakov, I. A.; Churkin, D. S.; Orishich, A. M.; Maslov, N. A.; Tsibul'skaya, E. O.; Lomzov, A. A.; Ermakova, O. V.; Trunov, A. N.; Chernykh, V. V.

    2018-05-01

    We report the results of an experimental study of the effect of short-pulse laser UV radiation on the eye scleral tissue. As samples, we used isolated flaps of the eye scleral tissue from the patients with open-angle glaucoma of the second and third stages. The impact was implemented using the radiation of an excimer XeCl laser with a wavelength of 308 nm and a laser with a wavelength tunable within from 210 to 355 nm. Depending on the problem to be solved, the energy density on the surface of the irradiated tissue varied from a fraction of mJ cm-2 to 15 J cm-2. For the first time we studied the optical properties of the intraocular fluid in the UV and blue spectral range. The study of the ablation process under the action of radiation with a wavelength of 308 nm showed that the rate of material evaporation can vary within 24%–30% at an energy density above 7 J cm-2, depending on the glaucoma stage and the individual features of a patient. The excitation–emission matrices of laser-induced fluorescence (LIF) of the eye scleral tissue were studied experimentally using a laser with a wavelength tuned in the range 210–355 nm. We found the differences in the LIF spectra caused by the excitation wavelength and the openangle glaucoma stage.

  9. Single-photon cesium Rydberg excitation spectroscopy using 318.6-nm UV laser and room-temperature vapor cell.

    Science.gov (United States)

    Wang, Jieying; Bai, Jiandong; He, Jun; Wang, Junmin

    2017-09-18

    We demonstrate a single-photon Rydberg excitation spectroscopy of cesium (Cs) atoms in a room-temperature vapor cell. Cs atoms are excited directly from 6S 1/2 ground state to nP 3/2 (n = 70 - 100) Rydberg states with a 318.6 nm ultraviolet (UV) laser, and Rydberg excitation spectra are obtained by transmission enhancement of a probe beam resonant to Cs 6S 1/2 , F = 4 - 6P 3/2 , F' = 5 transition as partial population on F = 4 ground state are transferred to Rydberg state. Analysis reveals that the observed spectra are velocity-selective spectroscopy of Rydberg state, from which the amplitude and linewidth influenced by lasers' Rabi frequency have been investigated. Fitting to energies of Cs nP 3/2 (n = 70 -100) states, the determined quantum defect is 3.56671(42). The demodulated spectra can also be employed as frequency references to stabilize the UV laser frequency to specific Cs Rydberg transition.

  10. Calibration of the OPAL jet chamber with UV laser beams. Measurement of the beam position with position-sensitive silicon diodes (PSD)

    International Nuclear Information System (INIS)

    Koch, J.

    1990-03-01

    The OPAL jet chamber is calibrated with tracks produced by UV laser beams. Lateral effect diodes are used for monitoring the laser beam location in the detector. These position sensitive detectors locate the point of impact in two dimensions by the charge division method. Measurements on several diodes were carried out in order to calibrate these devices and to investigate to observed pin-cushion distortion. Using the telegraphers equation suitable expressions were obtained for describing the observed behaviour. It was shown that the magnetic field of OPAL as well as the UV laser wavelength and puls duration had no influence on the position information. (orig.)

  11. Software-based data path for raster-scanned multi-beam mask lithography

    Science.gov (United States)

    Rajagopalan, Archana; Agarwal, Ankita; Buck, Peter; Geller, Paul; Hamaker, H. Christopher; Rao, Nagswara

    2016-10-01

    According to the 2013 SEMATECH Mask Industry Survey,i roughly half of all photomasks are produced using laser mask pattern generator ("LMPG") lithography. LMPG lithography can be used for all layers at mature technology nodes, and for many non-critical and semi-critical masks at advanced nodes. The extensive use of multi-patterning at the 14-nm node significantly increases the number of critical mask layers, and the transition in wafer lithography from positive tone resist to negative tone resist at the 14-nm design node enables the switch from advanced binary masks back to attenuated phase shifting masks that require second level writes to remove unwanted chrome. LMPG lithography is typically used for second level writes due to its high productivity, absence of charging effects, and versatile non-actinic alignment capability. As multi-patterning use expands from double to triple patterning and beyond, the number of LMPG second level writes increases correspondingly. The desire to reserve the limited capacity of advanced electron beam writers for use when essential is another factor driving the demand for LMPG capacity. The increasing demand for cost-effective productivity has kept most of the laser mask writers ever manufactured running in production, sometimes long past their projected lifespan, and new writers continue to be built based on hardware developed some years ago.ii The data path is a case in point. While state-ofthe- art when first introduced, hardware-based data path systems are difficult to modify or add new features to meet the changing requirements of the market. As data volumes increase, design styles change, and new uses are found for laser writers, it is useful to consider a replacement for this critical subsystem. The availability of low-cost, high-performance, distributed computer systems combined with highly scalable EDA software lends itself well to creating an advanced data path system. EDA software, in routine production today, scales

  12. What's in a mask? Information masking with forward and backward visual masks.

    Science.gov (United States)

    Davis, Chris; Kim, Jeesun

    2011-10-01

    Three experiments tested how the physical format and information content of forward and backward masks affected the extent of visual pattern masking. This involved using different types of forward and backward masks with target discrimination measured by percentage correct in the first experiment (with a fixed target duration) and by an adaptive threshold procedure in the last two. The rationale behind the manipulation of the content of the masks stemmed from masking theories emphasizing attentional and/or conceptual factors rather than visual ones. Experiment 1 used word masks and showed that masking was reduced (a masking reduction effect) when the forward and backward masks were the same word (although in different case) compared to when the masks were different words. Experiment 2 tested the extent to which a reduction in masking might occur due to the physical similarity between the forward and backward masks by comparing the effect of the same content of the masks in the same versus different case. The result showed a significant reduction in masking for same content masks but no significant effect of case. The last experiment examined whether the reduction in masking effect would be observed with nonword masks--that is, having no high-level representation. No reduction in masking was found from same compared to different nonword masks (Experiment 3). These results support the view that the conscious perception of a rapidly displayed target stimulus is in part determined by high-level perceptual/cognitive factors concerned with masking stimulus grouping and attention.

  13. Tunable high-power narrow-spectrum external-cavity diode laser at 675 nm as a pump source for UV generation

    DEFF Research Database (Denmark)

    Chi, Mingjun; Jensen, Ole Bjarlin; Erbert, Gotz

    2011-01-01

    High-power narrow-spectrum diode laser systems based on tapered gain media in external cavity are demonstrated at 675 nm. Two 2-mm-long amplifiers are used, one with a 500-µm-long ridge-waveguide section (device A), the other with a 750-µm-long ridge-waveguide section (device B). The laser system...... of 1.0 W. The laser system B based on device B is tunable from 666 to 685 nm. As high as 1.05 W output power is obtained around 675.67 nm. The emission spectral bandwidth is less than 0.07 nm throughout the tuning range, and the beam quality factor M2 is 1.13 at an output power of 0.93 W. The laser...... system B is used as a pump source for the generation of 337.6 nm UV light by single-pass frequency doubling in a BIBO crystal. An output power of 109 µW UV light, corresponding to a conversion efficiency of 0.026%W-1 is attained....

  14. Physicochemical modifications accompanying UV laser induced surface structures on poly(ethylene terephthalate) and their effect on adhesion of mesenchymal cells.

    Science.gov (United States)

    Rebollar, Esther; Pérez, Susana; Hernández, Margarita; Domingo, Concepción; Martín, Margarita; Ezquerra, Tiberio A; García-Ruiz, Josefa P; Castillejo, Marta

    2014-09-07

    This work reports on the formation of different types of structures on the surface of polymer films upon UV laser irradiation. Poly(ethylene terephthalate) was irradiated with nanosecond UV pulses at 193 and 266 nm. The polarization of the laser beam and the irradiation angle of incidence were varied, giving rise to laser induced surface structures with different shapes and periodicities. The irradiated surfaces were topographically characterized by atomic force microscopy and the chemical modifications induced by laser irradiation were inspected via micro-Raman and fluorescence spectroscopies. Contact angle measurements were performed with different liquids, and the results evaluated in terms of surface free energy components. Finally, in order to test the influence of surface properties for a potential application, the modified surfaces were used for mesenchymal stem cell culture assays and the effect of nanostructure and surface chemistry on cell adhesion was evaluated.

  15. Femtosecond UV laser non-ablative surface structuring of ZnO crystal: impact on exciton photoluminescence

    Energy Technology Data Exchange (ETDEWEB)

    Museur, Luc [Laboratoire de Physique des Lasers (LPL), UMR 7538 CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Michel, Jean-Pierre [Laboratoire des Proprietes Mecaniques et Thermodynamiques des Materiaux (LPMTM), UMR 9001 CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Portes, Patrick; Kanaev, Andrei V. [Laboratoire d' Ingenierie des Materiaux et des Hautes Pressions (LIMHP), UMR 1311 CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Englezis, Apostolis; Stassinopoulos, Andreas; Anglos, Demetrios [Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas (IESL-FORTH), 71110 Heraklion, Crete (Greece)

    2010-03-15

    The ultraviolet (UV) laser irradiation (248 nm) of monocrystalline wurtzite ZnO with 450 fs pulses results in surface modification. A formation of two orthogonal ripple structures with a period of 400-500 nm was observed oriented parallel and perpendicular to the laser beam polarization. The UV exciton emission obtained on the irradiated domains is found greatly enhanced locally up to {approx}10{sup 3} times. The photoluminescence band is redshifted by 2-3 nm and 40% narrower (full width at half-maximum), while at the same time the E{sub 2} (439 cm{sup -1}) Raman band intensity increases up to {approx}50 times. The process is found irreversible with the threshold fluence of 11 mJ/cm{sup 2}, which is considerably lower than the ablation threshold 115 mJ/cm{sup 2}. Fine surface nanostructuring on the scale of {approx}10 nm may be responsible for the observed effect. (c) 2008 Optical Society of America.

  16. Hyperfine structure and isotope shift of transitions in YbI using UV and deep-UV cw laser light and the angular distribution of fluorescence radiation

    NARCIS (Netherlands)

    Zinkstok, R.T.; van Duijn, E.J.; Witte, S.; Hogervorst, W.

    2002-01-01

    Using the third harmonic of a cw titanium:sapphire laser, the hyperfine structure (HFS) and isotope shift (IS) of three deep-UV transitions of neutral Yb have been measured for the first time. By exploiting the angular distribution of fluorescence radiation, accurate and complete results are

  17. Visualizing and quantifying dose distribution in a UV reactor using three-dimensional laser-induced fluorescence.

    Science.gov (United States)

    Gandhi, Varun N; Roberts, Philip J W; Kim, Jae-Hong

    2012-12-18

    Evaluating the performance of typical water treatment UV reactors is challenging due to the complexity in assessing spatial and temporal variation of UV fluence, resulting from highly unsteady, turbulent nature of flow and variation in UV intensity. In this study, three-dimensional laser-induced fluorescence (3DLIF) was applied to visualize and quantitatively analyze a lab-scale UV reactor consisting of one lamp sleeve placed perpendicular to flow. Mapping the spatial and temporal fluence delivery and MS2 inactivation revealed the highest local fluence in the wake zone due to longer residence time and higher UV exposure, while the lowest local fluence occurred in a region near the walls due to short-circuiting flow and lower UV fluence rate. Comparing the tracer based decomposition between hydrodynamics and IT revealed similar coherent structures showing the dependency of fluence delivery on the reactor flow. The location of tracer injection, varying the height and upstream distance from the lamp center, was found to significantly affect the UV fluence received by the tracer. A Lagrangian-based analysis was also employed to predict the fluence along specific paths of travel, which agreed with the experiments. The 3DLIF technique developed in this study provides new insight on dose delivery that fluctuates both spatially and temporally and is expected to aid design and optimization of UV reactors as well as validate computational fluid dynamics models that are widely used to simulate UV reactor performances.

  18. Selective degradation of lignin and elimination of HO radicals in pulps by O3 and UV laser flash irradiation

    Institute of Scientific and Technical Information of China (English)

    林鹿; 周贤涛; 邱玉桂

    2002-01-01

    HO radical is an aggressive reagent to abstract hydrogen from diverse substitutes and lead them to degradation, however, in reaction of active oxygen species with lignins, complex phenolic polymers, in dispersed lignocellulose such as pulp for environment-benign delignification, HO radicals should be eliminated as more as possible to prevent cellulose from unfavorably concomitant degradation. A reaction system of O3 is constructed under UV laser flash irradiation, and HO radicals are controlled efficiently by it. A new mechanism is proposed, for the first time, that O radicals generated from reaction of O3 with UV laser flash irradiation might be the contributor to scavenge HO radicals.

  19. A vacuum-UV laser-induced fluorescence experiment for measurement of rotationally and vibrationally excited H2

    International Nuclear Information System (INIS)

    Vankan, P.; Heil, S.B.S.; Mazouffre, S.; Engeln, R.; Schram, D.C.; Doebele, H.F.

    2004-01-01

    An experimental setup is built to detect spatially resolved rovibrationally excited hydrogen molecules via laser-induced fluorescence. To excite the hydrogen molecules, laser radiation is produced in the vacuum UV part of the spectrum. The laser radiation is tunable between 120 nm and 230 nm and has a bandwith of 0.15 cm -1 . The wavelength of the laser radiation is calibrated by simultaneous recording of the two-photon laser induced fluorescence spectrum of nitric oxide. The excited hydrogen populations are calibrated on the basis of coherent anti-Stokes Raman scattering measurements. A population distribution is measured in the shock region of a pure hydrogen plasma expansion. The higher rotational levels (J>5) show overpopulation compared to a Boltzmann distribution determined from the lower rotational levels (J≤5)

  20. NANOSCALE STRUCTURES GENERATION WITHIN THE SURFACE LAYER OF METALS WITH SHORT UV LASER PULSES

    Directory of Open Access Journals (Sweden)

    Dmitry S. Ivanov

    2017-01-01

    Full Text Available We have completed modeling of a laser pulse influence on a gold target. We have applied a hybrid atomistic-continuum model to analyze the physical mechanisms responsible for the process of nanostructuring. The model combines the advantages of Molecular Dynamics and Two Temperature Model. We have carried out a direct comparison of the modeling results and experimental data on nano-modification due to a single ps laser pulse at the energy densities significantly exceeding the melting threshold. The experimental data is obtained due to a laser pulse irradiation at the wavelength of 248 nm and duration of 1.6 ps. The mask projection (diffraction grating creates the sinusoidal intensity distribution on a gold surface with periods of 270 nm, 350 nm, and 500 nm. The experimental data and modeling results have demonstrated a good match subject to complex interrelations between a fast material response to the laser excitation, generation of crystal defects, phase transitions and hydrodynamic motion of matter under condition of strong laser-induced non-equilibrium. The performed work confirms the proposed approach as a powerful tool for revealing the physical mechanisms underlying the process of nanostructuring of metal surfaces. Detailed understanding of the dynamics of these processes gives the possibility for designing the topology of functional surfaces on nano- and micro-scales.

  1. Applications of UV-storage ring free electron lasers: the case of super-ACO

    CERN Document Server

    Nahon, L; Couprie, Marie Emmanuelle; Merola, F; Dumas, P; Marsi, M; Taleb-Ibrahimi, A; Nutarelli, D; Roux, R; Billardon, M

    1999-01-01

    The potential of UV-storage ring free electron lasers (SRFELs) for the performance of original application experiments is shown with a special emphasis concerning their combination with the naturally synchronized synchrotron radiation (SR). The first two-color FEL+SR experiment, performed in surface science at Super-ACO is reported. The experimental parameters found to be the most important as gathered from the acquired experience, are underlined and discussed. Finally, future prospects for the scientific program of the Super-ACO FEL are presented with two-color experiments combining the FEL with SR undulator-based XUV and VUV beamlines as well as with a SR white light bending magnet beamline emiting in the IR-UV (20 mu m-0.25 mu m).

  2. Quantification of UV-Visible and Laser Spectroscopic Techniques for Materials Accountability and Process Control

    International Nuclear Information System (INIS)

    Czerwinski, Kenneth; Weck, Phil

    2013-01-01

    Ultraviolet-visible spectroscopy (UV-Visible) and time-resolved laser fluorescence spectroscopy (TRLFS) optical techniques can permit on-line analysis of actinide elements in a solvent extraction process in real time. These techniques have been used for measuring actinide speciation and concentration under laboratory conditions and are easily adaptable to multiple sampling geometries, such as dip probes, fiber-optic sample cells, and flow-through cell geometries. To fully exploit these techniques, researchers must determine the fundamental speciation of target actinides and the resulting influence on spectroscopic properties. Detection limits, process conditions, and speciation of key actinide components can be established and utilized in a range of areas, particularly those related to materials accountability and process control. Through this project, researchers will develop tools and spectroscopic techniques to evaluate solution extraction conditions and concentrations of U, Pu, and Cm in extraction processes, addressing areas of process control and materials accountability. The team will evaluate UV- Visible and TRLFS for use in solvent extraction-based separations. Ongoing research is examining efficacy of UV-Visible spectroscopy to evaluate uranium and plutonium speciation under conditions found in the UREX process and using TRLFS to evaluate Cm speciation and concentration in the TALSPEAK process. A uranyl and plutonium nitrate UV-Visible spectroscopy study met with success, which supports the utility and continued exploration of spectroscopic methods for evaluation of actinide concentrations and solution conditions for other aspects of the UREX+ solvent extraction scheme. This project will examine U and Pu absorbance in TRUEX and TALSPEAK, perform detailed examination of Cm in TRUEX and TALSPEAK, study U laser fluorescence, and apply project data to contactors. The team will also determine peak ratios as a function of solution concentrations for the UV

  3. Changes in the DRIFT Spectra of Softwood Materials Irradiated by UV-laser as a Function of Energy

    Directory of Open Access Journals (Sweden)

    BARTA, Edit

    2005-01-01

    Full Text Available We investigated energy dependence of the effect of UV-laser irradiation on the DRIFT spectra of softwood samples. Changes in the spectra of softwoods have been studied with 248.5 nm wavelength of UV-laser radiation. To monitor the energy dependence, different number of laser impulses were directed towards the sample’s surface. The dependence on energy of different bands can be listed into four groups. Broad absorption bands, which belong to the same chemical groups located at various positions, do not show consistent changes due to the absorption of different energy dozes. The intensity of OH bands for the treated samples can be higher or lower depending on the amount of radiation energy. In the CHn and in the band of non-conjugated carbonyl groups only absorption increase can be observed. Bands resulting from only one chemical component, and containing no other absorption maxima around them, uniformly decreased. The regions where the band of a chemical component lies next to another one, showed no consistent changes during the irradiation. The initial decrease was followed by increase.

  4. Migration from full-head mask to "open-face" mask for immobilization of patients with head and neck cancer.

    Science.gov (United States)

    Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-09-06

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to

  5. Autofluorescence of pigmented skin lesions using a pulsed UV laser with synchronized detection: clinical results

    DEFF Research Database (Denmark)

    Cheng, Haynes Pak Hay; Svenmarker, Pontus; Tidemand-Lichtenberg, Peter

    2010-01-01

    signal, which may in turn produce high contrast images that improve diagnosis, even in the presence of ambient room light. The synchronized set-up utilizes a compact, diode pumped, pulsed UV laser at 355 nm which is coupled to a CCD camera and a liquid crystal tunable filter. The excitation and image......We report preliminary clinical results of autofluorescence imaging of malignant and benign skin lesions, using pulsed 355 nm laser excitation with synchronized detection. The novel synchronized detection system allows high signal-to-noise ratio to be achieved in the resulting autofluorescence...

  6. SO2 Spectroscopy with A Tunable UV Laser

    Science.gov (United States)

    Morey, W. W.; Penney, C. M.; Lapp, M.

    1973-01-01

    A portion of the fluorescence spectrum of SO2 has been studied using a narrow wavelength doubled dye laser as the exciting source. One purpose of this study is to evaluate the use of SO2 resonance re-emission as a probe of SO2 in the atmosphere. When the SO2 is excited by light at 300.2 nm, for example, a strong reemission peak is observed which is Stokes-shifted from the incident light wavelength by the usual Raman shift (the VI symmetric vibration frequency 1150.5/cm ). The intensity of this peak is sensitive to small changes (.01 nm) in the incident wavelength. Measurements of the N2 quenching and self quenching of this re-emission have been obtained. Preliminary analysis of this data indicates that the quenching is weak but not negligible. The dye laser in our system is pumped by a pulsed N2 laser. Tuning 'and spectral narrowing are accomplished using a telescope-echelle grating combination. In a high power configuration the resulting pulses have a spectral width of about 5 x 10(exp -3) nm and a time duration of about 6 nsec. The echelle grating is rotated by a digital stepping motor, such that each step shifts the wavelength by 6 x 10(exp -4) nm. In addition to the tunable, narrow wavelength uv source and spectral analysis of the consequent re-emission, the system also provides time resolution of the re-emitted light to 6 nsec resolution. This capability is being used to study the lifetime of low pressure S02 fluorescence at different wavelengths and pressures.

  7. Nanosecond UV lasers stimulate transient Ca2+ elevations in human hNT astrocytes.

    Science.gov (United States)

    Raos, B J; Graham, E S; Unsworth, C P

    2017-06-01

    Astrocytes respond to various stimuli resulting in intracellular Ca 2+ signals that can propagate through organized functional networks. Recent literature calls for the development of techniques that can stimulate astrocytes in a fast and highly localized manner to emulate more closely the characteristics of astrocytic Ca 2+ signals in vivo. In this article we demonstrate, for the first time, how nanosecond UV lasers are capable of reproducibly stimulating Ca 2+ transients in human hNT astrocytes. We report that laser pulses with a beam energy of 4-29 µJ generate transient increases in cytosolic Ca 2+ . These Ca 2+ transients then propagate to adjacent astrocytes as intercellular Ca 2+ waves. We propose that nanosecond laser stimulation provides a valuable tool for enabling the study of Ca 2+ dynamics in human astrocytes at both a single cell and network level. Compared to previously developed techniques nanosecond laser stimulation has the advantage of not requiring loading of photo-caged or -sensitising agents, is non-contact, enables stimulation with a high spatiotemporal resolution and is comparatively cost effective.

  8. UV-Visible Absorption Spectroscopy Enhanced X-ray Crystallography at Synchrotron and X-ray Free Electron Laser Sources.

    Science.gov (United States)

    Cohen, Aina E; Doukov, Tzanko; Soltis, Michael S

    2016-01-01

    This review describes the use of single crystal UV-Visible Absorption micro-Spectrophotometry (UV-Vis AS) to enhance the design and execution of X-ray crystallography experiments for structural investigations of reaction intermediates of redox active and photosensitive proteins. Considerations for UV-Vis AS measurements at the synchrotron and associated instrumentation are described. UV-Vis AS is useful to verify the intermediate state of an enzyme and to monitor the progression of reactions within crystals. Radiation induced redox changes within protein crystals may be monitored to devise effective diffraction data collection strategies. An overview of the specific effects of radiation damage on macromolecular crystals is presented along with data collection strategies that minimize these effects by combining data from multiple crystals used at the synchrotron and with the X-ray free electron laser.

  9. Excimer laser applications

    International Nuclear Information System (INIS)

    Fantoni, R.

    1988-01-01

    This lecture deals with laser induced material photoprocessing, especially concerning those processes which are initiated by u.v. lasers (mostly excimer laser). Advantages of using the u.v. radiation emitted by excimer lasers, both in photophysical and photochemical processes of different materials, are discussed in detail. Applications concerning microelectronics are stressed with respect to other applications in different fields (organic chemistry, medicine). As further applications of excimer lasers, main spectroscopic techniques for ''on line'' diagnostics which employ excimer pumped dye lasers, emitting tunable radiation in the visible and near u.v. are reviewed

  10. Direct synthesis of graphitic mesoporous carbon from green phenolic resins exposed to subsequent UV and IR laser irradiations

    Science.gov (United States)

    Sopronyi, Mihai; Sima, Felix; Vaulot, Cyril; Delmotte, Luc; Bahouka, Armel; Matei Ghimbeu, Camelia

    2016-01-01

    The design of mesoporous carbon materials with controlled textural and structural features by rapid, cost-effective and eco-friendly means is highly demanded for many fields of applications. We report herein on the fast and tailored synthesis of mesoporous carbon by UV and IR laser assisted irradiations of a solution consisting of green phenolic resins and surfactant agent. By tailoring the UV laser parameters such as energy, pulse repetition rate or exposure time carbon materials with different pore size, architecture and wall thickness were obtained. By increasing irradiation dose, the mesopore size diminishes in the favor of wall thickness while the morphology shifts from worm-like to an ordered hexagonal one. This was related to the intensification of phenolic resin cross-linking which induces the reduction of H-bonding with the template as highlighted by 13C and 1H NMR. In addition, mesoporous carbon with graphitic structure was obtained by IR laser irradiation at room temperature and in very short time periods compared to the classical long thermal treatment at very high temperatures. Therefore, the carbon texture and structure can be tuned only by playing with laser parameters, without extra chemicals, as usually required. PMID:28000781

  11. Final LDRD report : science-based solutions to achieve high-performance deep-UV laser diodes.

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, Andrew M.; Miller, Mary A.; Crawford, Mary Hagerott; Alessi, Leonard J.; Smith, Michael L.; Henry, Tanya A.; Westlake, Karl R.; Cross, Karen Charlene; Allerman, Andrew Alan; Lee, Stephen Roger

    2011-12-01

    We present the results of a three year LDRD project that has focused on overcoming major materials roadblocks to achieving AlGaN-based deep-UV laser diodes. We describe our growth approach to achieving AlGaN templates with greater than ten times reduction of threading dislocations which resulted in greater than seven times enhancement of AlGaN quantum well photoluminescence and 15 times increase in electroluminescence from LED test structures. We describe the application of deep-level optical spectroscopy to AlGaN epilayers to quantify deep level energies and densities and further correlate defect properties with AlGaN luminescence efficiency. We further review our development of p-type short period superlattice structures as an approach to mitigate the high acceptor activation energies in AlGaN alloys. Finally, we describe our laser diode fabrication process, highlighting the development of highly vertical and smooth etched laser facets, as well as characterization of resulting laser heterostructures.

  12. Green binary and phase shifting mask

    Science.gov (United States)

    Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang

    2009-12-01

    SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).

  13. Reusable High Aspect Ratio 3-D Nickel Shadow Mask

    Science.gov (United States)

    Shandhi, M.M.H.; Leber, M.; Hogan, A.; Warren, D.J.; Bhandari, R.; Negi, S.

    2017-01-01

    Shadow Mask technology has been used over the years for resistless patterning and to pattern on unconventional surfaces, fragile substrate and biomaterial. In this work, we are presenting a novel method to fabricate high aspect ratio (15:1) three-dimensional (3D) Nickel (Ni) shadow mask with vertical pattern length and width of 1.2 mm and 40 μm respectively. The Ni shadow mask is 1.5 mm tall and 100 μm wide at the base. The aspect ratio of the shadow mask is 15. Ni shadow mask is mechanically robust and hence easy to handle. It is also reusable and used to pattern the sidewalls of unconventional and complex 3D geometries such as microneedles or neural electrodes (such as the Utah array). The standard Utah array has 100 active sites at the tip of the shaft. Using the proposed high aspect ratio Ni shadow mask, the Utah array can accommodate 300 active sites, 200 of which will be along and around the shaft. The robust Ni shadow mask is fabricated using laser patterning and electroplating techniques. The use of Ni 3D shadow mask will lower the fabrication cost, complexity and time for patterning out-of-plane structures. PMID:29056835

  14. Temporal laser pulse shaping for RF photocathode guns: the cheap and easy way using UV birefringent crystals

    International Nuclear Information System (INIS)

    Power, J.G.; Jing, C.

    2009-01-01

    We report experimental investigations into a new technique for achieving temporal laser pulse shaping for RF photocathode gun applications using inexpensive UV birefringent crystals. Exploiting the group velocity mismatch between the two different polarizations of a birefringent crystal, a stack of UV pulses can be assembled into the desired temporal pulse shape. The scheme is capable of generating a variety of temporal pulse shapes including: (i) flat-top pulses with fast rise-time and variable pulse duration. (ii) microbunch trains, and (iii) ramped pulse generation. We will consider two applications for beam generation at the Argonne Wakefield Accelerator (AWA) including a flat-top laser pulse for low emittance production and matched bunch length for enhanced transformer ratio production. Streak camera measurements of the temporal profiles generated with a 2-crystal set and a 4-crystal set are presented.

  15. Induction of lambda prophage near the site of focused UV laser radiation

    Energy Technology Data Exchange (ETDEWEB)

    Matchette, L.S.; Waynant, R.W.; Royston, D.D.; Hitchins, V.M.; Elespuru, R.K.

    1989-02-01

    DNA damage from photon scatter or beam spread during UV excimer laser irradiation was investigated using the induction of bacteriophage lambda in E. coli BR339. Prophage induction in these cells leads to the production of ..beta..-galactosidase which can be detected colorimetrically by the application of appropriate substates. An agar surface overlayed with BR339 cells was placed at various distances from the focal point of a converging lens and exposed to either 193 or 248 nm laser radiation. Energy densities ranging from approximately 5 mJ/cm/sup 2/ to 30 J/cm/sup 2/ were used. Ablation with 193 nm laser radiation produced an 800 ..mu..m wide clear 'trench' surrounded by a 500 ..mu..m zone of cells in which lambda had been induced. Following ablation with 248 nm laser radiation, the zone of induction was several millimeters wide. Exposures to 193 nm radiation at 170 mJ/cm/sup 2//pulse produced visible ablation of the agar surface at 1.7 J/cm/sup 2/. Lambda induction was observed surrounding cleared ablation areas. The presence of induction in this system suggests that both 248 and 193 nm excimer laser radiation delivered at high energy densities has sufficient spread or scatter to damage DNA in cells surrounding areas of ablation.

  16. Photolysis of phosphodiester bonds in plasmid DNA by high intensity UV laser irradiation

    International Nuclear Information System (INIS)

    Croke, D.T.; Blau, Werner; OhUigin, Colm; Kelly, J.M.; McConnell, D.J.

    1988-01-01

    The cleavage of phosphodiester bonds in DNA exposed to high intensity UV laser pulses in aerated aqueous solution has been investigated using a krypton fluoride excimer laser (248 nm) and bacterial plasmid DNA. The dependence of strand breakage on fluence and intensity has been studied in detail and shows that the process is non-linear with respect to intensity. The relationship between the quantum yield for strand breakage and intensity shows that the strand breakage reaction involves two-photon excitation of DNA bases. The quantum yield rises with intensity from a lower value of 7 x 10 -5 until a maximum value of 4.5 x 10 -4 is attained at intensities of 10 11 W m -2 and above. This value is approximately fifty-fold higher than the quantum yield for strand breakage induced by exposure to low density UV irradiation (254 nm, 12 W m -2 ). DNA sequencing experiments have shown that strand breakage occurs by the specific cleavage of the phosphodiester bond which lies immediately 3' to guanine residues in the DNA, leaving some alkali-labile remnant attached to the terminal phosphate. A mechanism for DNA strand breakage which involves the generation of guanine radical cations is proposed. (author)

  17. Fabrication of porous biopolymer substrates for cell growth by UV laser: The role of pulse duration

    International Nuclear Information System (INIS)

    Castillejo, Marta; Rebollar, Esther; Oujja, Mohamed; Sanz, Mikel; Selimis, Alexandros; Sigletou, Maria; Psycharakis, Stelios; Ranella, Anthi; Fotakis, Costas

    2012-01-01

    Highlights: ► UV laser-induced superficial foaming in biopolymer films with fs, ps and ns pulses. ► Reduction of photochemical and structural modifications by ultrashort fs irradiation. ► Successful cell culture on laser-induced foam structure generated in chitosan. - Abstract: Ultraviolet laser irradiation using pulses with duration from the nanosecond to the femtosecond range was investigated aiming at the generation of a foam layer on films of the biopolymers chitosan, starch and their blend. We report on the morphological characteristics of the foams obtained upon irradiation and on the accompanying laser induced photochemistry, assessed by on line monitoring of the laser induced fluorescence. We identify the laser conditions (pulse duration) at which foaming is produced and discuss the obtained results in reference to the material properties, particularly extinction coefficient and thermal parameters. This article also reports on successful cell culture on the laser induced foam structure generated in chitosan, as an illustrative example of the possibility of broader use of laser induced biopolymer foaming structures in biology.

  18. Effect of nanosecond UV laser irradiation on luminescence and absorption in silver- and copper-containing phosphate glasses

    Science.gov (United States)

    Murashov, A. A.; Sidorov, A. I.; Stoliarchuk, M. V.

    2018-03-01

    Experimental evidence is presented that nanosecond UV laser irradiation of silver- and copper-containing barium phosphate glasses leads to luminescence quenching in the visible range. Subsequent heat treatment induces an absorption in the range 350–500 nm. These effects are due to the ionisation and fragmentation of subnanometre molecular clusters by laser radiation and subsequent (heat treatment-induced) formation of nanoparticles possessing plasmon resonance. Our numerical modelling results demonstrate the feasibility of producing stable AgnCum hybrid molecular clusters in glass. Local modification of the optical properties of glass by laser light can be used for optical information recording.

  19. Test measurements on a secco white-lead containing model samples to assess the effects of exposure to low-fluence UV laser radiation

    International Nuclear Information System (INIS)

    Raimondi, Valentina; Andreotti, Alessia; Colombini, Maria Perla; Cucci, Costanza; Cuzman, Oana; Galeotti, Monica; Lognoli, David; Palombi, Lorenzo; Picollo, Marcello; Tiano, Piero

    2015-01-01

    Highlights: • A set of a secco model samples was prepared using white lead and four different organic binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). • The samples were irradiated with low-fluence UV laser pulses (0.1–1 mJ/cm 2 ). • The effects of laser irradiation were analysed by using different techniques. • The analysis did not point out changes due to low-fluence laser irradiation. • High fluence (88 mJ/cm 2 ) laser radiation instead yielded a chromatic change ascribed to the inorganic component. - Abstract: Laser-induced fluorescence technique is widely used for diagnostic purposes in several applications and its use could be of advantage for non-invasive on-site characterisation of pigments or other compounds in wall paintings. However, it is well known that long-time exposure to UV and VIS radiation can cause damage to wall paintings. Several studies have investigated the effects of lighting, e.g., in museums: however, the effects of low-fluence laser radiation have not been studied much so far. This paper investigates the effects of UV laser radiation using fluences in the range of 0.1 mJ/cm 2 –1 mJ/cm 2 on a set of a secco model samples prepared with lead white and different type of binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). The samples were irradiated using a Nd:YAG laser (emission wavelength at 355 nm; pulse width: 5 ns) by applying laser fluences between 0.1 mJ/cm 2 and 1 mJ/cm 2 and a number of laser pulses between 1 and 500. The samples were characterised before and after laser irradiation by using several techniques (colorimetry, optical microscopy, fibre optical reflectance spectroscopy, FT-IR spectroscopy Attenuated Total Reflectance microscopy and gas chromatography/mass spectrometry), to detect variations in the morphological and physico-chemical properties. The results did not point out significant changes in the sample properties after irradiation in the proposed

  20. GaN thin films growth and their application in photocatalytic removal of sulforhodamine B from aqueous solution under UV pulsed laser irradiation.

    Science.gov (United States)

    Gondal, Mohammed A; Chang, Xiao F; Yamani, Zain H; Yang, Guo F; Ji, Guang B

    2011-01-01

    Single-crystalline Gallium Nitride (GaN) thin films were fabricated and grown by metal organic chemical vapor deposition (MOCVD) method on c-plane sapphire substrates and then characterized by high resolution-X-ray diffraction (HR-XRD) and photoluminescence (PL) measurements. The photocatalytic decomposition of Sulforhodamine B (SRB) molecules on GaN thin films was investigated under 355 nm pulsed UV laser irradiation. The results demonstrate that as-grown GaN thin films exhibited efficient degradation of SRB molecules and exhibited an excellent photocatalytic-activity-stability under UV pulsed laser exposure.

  1. UV Raman spectroscopy of H2-air flames excited with a narrowband KrF laser

    Science.gov (United States)

    Shirley, John A.

    1990-01-01

    Raman spectra of H2 and H2O in flames excited by a narrowband KrF excimer laser are reported. Observations are made over a porous-plug, flat-flame burner reacting H2 in air, fuel-rich with nitrogen dilution to control the temperature, and with an H2 diffusion flame. Measurements made from UV Raman spectra show good agreement with measurements made by other means, both for gas temperature and relative major species concentrations. Laser-induced fluorescence interferences arising from OH and O2 are observed in emission near the Raman spectra. These interferences do not preclude Raman measurements, however.

  2. Laboratory demonstration of an optical vortex mask coronagraph using photonic crystal

    Science.gov (United States)

    Murakami, N.; Baba, N.; Ise, A.; Sakamoto, M.; Oka, K.

    2010-10-01

    Photonic crystal, artificial periodic nanostructure, is an attractive device for constructing focal-plane phase-mask coronagraphs such as segmented phase masks (four-quadrant, eight-octant, and 4N-segmented ones) and an optical vortex mask (OVM), because of its extremely small manufacturing defect. Recently, speckle-noise limited contrast has been demonstrated for two monochromatic lasers by using the eight-octant phase-mask made of the photonic crystal (Murakami et al. 2010, ApJ, 714, 772). We applied the photonic-crystal device to the OVM coronagraph. The OVM is more advantageous over the segmented phase masks because it does not have discontinuities other than a central singular point and provides a full on-sky field of view. For generating an achromatic optical vortex, we manufactured an axially-symmetric half-wave plate (ASHWP). It is expected that a size of the manufacturing defect due to the central singularity is an order of several hundreds nanometers. The ASHWP is placed between two circular polarizers for modulating a Pancharatnam phase. A continuous spiral phase modulation is then implemented achromatically. We carried out preliminary laboratory demonstration of the OVM coronagraph using two monochromatic lasers as a model star (wavelengths of 532 nm and 633 nm). We report a principle of the achromatic optical-vortex generation, and results of the laboratory demonstration of the OVM coronagraph.

  3. Stimulation of DNA synthesis by 340nm/ 351nm UV laser irradiation

    International Nuclear Information System (INIS)

    Meldrum, R.A.; Wharton, C.W.

    1991-01-01

    During preliminary experiments designed to test the feasibility of using a 'caged' DNA break trapping agent, the authors observed a stimulation of incorporation of 3 H-thymidine into DNA when cells were irradiated with low doses (100-1000J/m 2 ) of 351nm UV laser irradiation. This wavelength is used to photolyse 'caged' dideoxynucleotides in our fast time course measurements of DNA repair in mammalian cells. The dose at which this stimulation was observed is well below that at which measurable damage is detected. (author)

  4. Laser- and UV-assisted modification of polystyrene surfaces for control of protein adsorption and cell adhesion

    International Nuclear Information System (INIS)

    Pfleging, Wilhelm; Torge, Maika; Bruns, Michael; Trouillet, Vanessa; Welle, Alexander; Wilson, Sandra

    2009-01-01

    An appropriate choice of laser and process parameters enables new approaches for the fabrication of polymeric lab-on-chip devices with integrated functionalities. We will present our current research results in laser-assisted modification of polystyrene (PS) with respect to the fabrication of polymer devices for cell culture applications. For this purpose laser micro-patterning of PS and subsequent surface functionalization was investigated as function of laser and process parameters. A high power ArF-excimer laser radiation source with a pulse length of 19 ns as well as a high repetition ArF-excimer laser source with a pulse length of 5 ns were used in order to study the influence of laser pulse length on laser-induced surface oxidation. The change in surface chemistry was characterized by X-ray photoelectron spectroscopy and contact angle measurements. The difference between laser-assisted modification versus UV-lamp assisted modification was investigated. A photolytic activation of specific areas of the polymer surface and subsequent oxidization in oxygen or ambient air leads to a chemically modified polymer surface bearing carboxylic acid groups well-suited for controlled competitive protein adsorption or protein immobilization. Finally, distinct areas for cell growth and adhesion are obtained

  5. Migration from full‐head mask to “open‐face” mask for immobilization of patients with head and neck cancer

    Science.gov (United States)

    Lovelock, D. Michael; Mechalakos, James; Rao, Shyam; Della‐Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-01-01

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an “open‐face” thermoplastic mask was evaluated using video‐based optical surface imaging (OSI) and kilovoltage (kV) X‐ray radiography. A three‐point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real‐time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15 minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open‐face and full‐head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open‐face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real‐time OSI. With the open‐face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre‐/post‐treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask‐locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open‐face and full‐head masks were found to be similar. Most (80%) of the volunteers preferred the open‐face mask to the full‐head mask, while claustrophobic patients could only tolerate the open‐face mask. The open‐face mask is characterized for its immobilization capability and can immobilize patients sufficiently (face mask is readily adopted in radiotherapy clinic as a superior alternative to the standard full‐head mask. PACS numbers: 87.19.xj, 87.63.L‐, 87.59.‐e, 87.55.tg, 87.55.‐x PMID:24036878

  6. Toward a comprehensive UV laser ablation modeling of multicomponent materials—A non-equilibrium investigation on titanium carbide

    Science.gov (United States)

    Ait Oumeziane, Amina; Parisse, Jean-Denis

    2018-05-01

    Titanium carbide (TiC) coatings of great quality can be produced using nanosecond pulsed laser deposition (PLD). Because the deposition rate and the transfer of the target stoichiometry depend strongly on the laser-target/laser-plasma interaction as well as the composition of the laser induced plume, investigating the ruling fundamental mechanisms behind the material ablation and the plasma evolution in the background environment under PLD conditions is essential. This work, which extends previous investigations dedicated to the study of nanosecond laser ablation of pure target materials, is a first step toward a comprehensive non-equilibrium model of multicomponent ones. A laser-material interaction model coupled to a laser-plasma interaction one is presented. A UV 20 ns KrF (248 nm) laser pulse is considered. Ablation depths, plasma ignition thresholds, and shielding rates have been calculated for a wide range of laser beam fluences. A comparison of TiC behavior with pure titanium material under the same conditions is made. Plasma characteristics such as temperature and composition have been investigated. An overall correlation between the various results is presented.

  7. Table-top instrumentation for time-resolved luminescence spectroscopy of solids excited by nanosecond pulse of soft X-ray source and/or UV laser

    International Nuclear Information System (INIS)

    Bruza, Petr; Fidler, Vlastimil; Nikl, Martin

    2011-01-01

    The practical applicability of the rare-earth doped scintillators in high-speed detectors is limited by the slow decay components in the temporal response of a scintillator. The study of origin and properties of material defects that induce the slow decay components is of major importance for the development of new scintillation materials. We present a table-top, time-domain UV-VIS luminescence spectrometer, featuring extended time and input sensitivity ranges and two excitation sources. The combination of both soft X-ray/XUV and UV excitation source allows the comparative measurements of luminescence spectra and decay kinetics of scintillators to be performed under the same experimental conditions. The luminescence of emission centers of a doped scintillator can be induced by conventional N 2 laser pulse, while the complete scintillation process can be initiated by a soft X-ray/XUV pulse excitation from the laser-produced plasma in gas puff target of 4 ns duration. In order to demonstrate the spectrometer, the UV-VIS luminescence spectra and decay kinetics of cerium doped Lu 3 Al 5 O 12 single crystal (LuAG:Ce) scintillator excited by XUV and UV radiation were acquired. Luminescence of the doped Ce 3+ ions was studied under 2.88 nm (430 eV) XUV excitation from the laser-produced nitrogen plasma, and compared with the luminescence under 337 nm (3.68 eV) UV excitation from nitrogen laser. In the former case the excitation energy is deposited in the LuAG host, while in the latter the 4f-5d 2 transition of Ce 3+ is directly excited. Furthermore, YAG:Ce and LuAG:Ce single crystals luminescence decay profiles are compared and discussed.

  8. The EGFR family of receptors sensitizes cancer cells towards UV light

    DEFF Research Database (Denmark)

    Petersen, Steffen B.; Neves Petersen, Teresa; Olsen, Birgitte

    2008-01-01

    A combination of bioinformatics, biophysical, advanced laser studies and cell biology lead to the realization that laser-pulsed UV light stops cancer growth and induces apoptosis. We have previously shown that laser-pulsed UV (LP-UV) illumination of two different skin-derived cancer cell lines both...... bridges. The EGF receptor is often overexpressed in cancers and other proliferative skin disorders, it might be possible to significantly reduce the proliferative potential of these cells making them good targets for laser-pulsed UV-light treatment. The discovery that UV light can be used to open...... disulphide bridges in proteins upon illumination of nearby aromatic amino acids was the first step that lead to the hypothesis that UV light could modulate the structure and therefore the function of these key receptor proteins. The observation that membrane receptors (EGFR) contained exactly the motifs...

  9. Jitter-correction for IR/UV-XUV pump-probe experiments at the FLASH free-electron laser

    International Nuclear Information System (INIS)

    Savelyev, Evgeny; Boll, Rebecca; Bomme, Cedric; Schirmel, Nora; Redlin, Harald

    2017-01-01

    In pump-probe experiments employing a free-electron laser (FEL) in combination with a synchronized optical femtosecond laser, the arrival-time jitter between the FEL pulse and the optical laser pulse often severely limits the temporal resolution that can be achieved. Here, we present a pump-probe experiment on the UV-induced dissociation of 2,6-difluoroiodobenzene C 6 H 3 F 2 I) molecules performed at the FLASH FEL that takes advantage of recent upgrades of the FLASH timing and synchronization system to obtain high-quality data that are not limited by the FEL arrival-time jitter. Here, we discuss in detail the necessary data analysis steps and describe the origin of the time-dependent effects in the yields and kinetic energies of the fragment ions that we observe in the experiment.

  10. Tritium-doping enhancement of polystyrene by ultraviolet laser and hydrogen plasma irradiation for laser fusion experiments

    Energy Technology Data Exchange (ETDEWEB)

    Iwasa, Yuki, E-mail: iwasa-y@ile.osaka-u.ac.jp [Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871 (Japan); Yamanoi, Kohei; Iwano, Keisuke; Empizo, Melvin John F.; Arikawa, Yasunobu; Fujioka, Shinsuke; Sarukura, Nobuhiko; Shiraga, Hiroyuki; Takagi, Masaru; Norimatsu, Takayoshi; Azechi, Hiroshi [Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871 (Japan); Noborio, Kazuyuki; Hara, Masanori; Matsuyama, Masao [Hydrogen Isotope Research Center, Organization for Promotion of Research, University of Toyama, 3190 Gofuku, Toyama 930-8555 (Japan)

    2016-11-15

    Highlights: • Tritium-doped polystyrene films are fabricated by the Wilzbach method with UV laser and hydrogen plasma irradiation. • The 266-nm laser-irradiated, 355-nm laser-irradiated, and hydrogen plasma-irradiated polystyrene films exhibit higher PSL intensities and specific radioactivities than the non-irradiated sample. • Tritium doping by UV laser irradiation can be largely affected by the laser wavelength because of polystyrene’s absorption. • Hydrogen plasma irradiation results to a more uniform doping concentration even at low partial pressure and short irradiation time. • UV laser and plasma irradiations can be utilized to fabricate tritium-doped polystyrene shell targets for future laser fusion experiments. - Abstract: We investigate the tritium-doping enhancement of polystyrene by ultraviolet (UV) laser and hydrogen plasma irradiation. Tritium-doped polystyrene films are fabricated by the Wilzbach method with UV laser and hydrogen plasma. The 266-nm laser-irradiated, 355-nm laser-irradiated, and hydrogen plasma-irradiated polystyrene films exhibit higher PSL intensities and specific radioactivities than the non-irradiated sample. Tritium doping by UV laser irradiation can be largely affected by the laser wavelength because of polystyrene’s absorption. In addition, UV laser irradiation is more localized and concentrated at the spot of laser irradiation, while hydrogen plasma irradiation results to a more uniform doping concentration even at low partial pressure and short irradiation time. Both UV laser and plasma irradiations can nevertheless be utilized to fabricate tritium-doped polystyrene targets for future laser fusion experiments. With a high doping rate and efficiency, a 1% tritium-doped polystyrene shell target having 7.6 × 10{sup 11} Bq g{sup −1} specific radioactivity can be obtained at a short period of time thereby decreasing tritium consumption and safety management costs.

  11. Periodic nanostructures fabricated on GaAs surface by UV pulsed laser interference

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Wei; Huo, Dayun; Guo, Xiaoxiang; Rong, Chen; Shi, Zhenwu, E-mail: zwshi@suda.edu.cn; Peng, Changsi, E-mail: changsipeng@suda.edu.cn

    2016-01-01

    Graphical abstract: - Highlights: • Periodic nanostructures were fabricated on GaAs wafers by four-beam laser interference patterning which have potential applications in many fields. • Significant different results were obtained on epi-ready and homo-epitaxial GaAs substrate surfaces. • Two-pulse patterning was carried out on homo-epitaxial GaAs substrate, a noticeable morphology transformation induced by the second pulse was observed. • Temperature distribution on sample surface as a function of time and position was calculated by solving the heat diffusion equations. The calculation agrees well with the experiment results. - Abstract: In this paper, periodic nanostructures were fabricated on GaAs wafers by four-beam UV pulsed laser interference patterning. Significant different results were observed on epi-ready and homo-epitaxial GaAs substrate surfaces, which suggests GaAs oxide layer has an important effect on pulsed laser irradiation process. In the case of two-pulse patterning, a noticeable morphology transformation induced by the second pulse was observed on homo-epitaxial GaAs substrate. Based on photo-thermal mode, temperature distribution on sample surface as a function of time and position was calculated by solving the heat diffusion equations.

  12. Test measurements on a secco white-lead containing model samples to assess the effects of exposure to low-fluence UV laser radiation

    Energy Technology Data Exchange (ETDEWEB)

    Raimondi, Valentina, E-mail: v.raimondi@ifac.cnr.it [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Andreotti, Alessia; Colombini, Maria Perla [Chemistry and Industrial Chemistry Department (DCCI) - University of Pisa, Pisa (Italy); Cucci, Costanza [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Cuzman, Oana [Institute for the Conservation and Promotion of Cultural Heritage - National Research Council (CNR-ICVBC), Firenze (Italy); Galeotti, Monica [Opificio delle Pietre Dure (OPD), Firenze (Italy); Lognoli, David; Palombi, Lorenzo; Picollo, Marcello [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Tiano, Piero [Institute for the Conservation and Promotion of Cultural Heritage - National Research Council (CNR-ICVBC), Firenze (Italy)

    2015-05-15

    Highlights: • A set of a secco model samples was prepared using white lead and four different organic binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). • The samples were irradiated with low-fluence UV laser pulses (0.1–1 mJ/cm{sup 2}). • The effects of laser irradiation were analysed by using different techniques. • The analysis did not point out changes due to low-fluence laser irradiation. • High fluence (88 mJ/cm{sup 2}) laser radiation instead yielded a chromatic change ascribed to the inorganic component. - Abstract: Laser-induced fluorescence technique is widely used for diagnostic purposes in several applications and its use could be of advantage for non-invasive on-site characterisation of pigments or other compounds in wall paintings. However, it is well known that long-time exposure to UV and VIS radiation can cause damage to wall paintings. Several studies have investigated the effects of lighting, e.g., in museums: however, the effects of low-fluence laser radiation have not been studied much so far. This paper investigates the effects of UV laser radiation using fluences in the range of 0.1 mJ/cm{sup 2}–1 mJ/cm{sup 2} on a set of a secco model samples prepared with lead white and different type of binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). The samples were irradiated using a Nd:YAG laser (emission wavelength at 355 nm; pulse width: 5 ns) by applying laser fluences between 0.1 mJ/cm{sup 2} and 1 mJ/cm{sup 2} and a number of laser pulses between 1 and 500. The samples were characterised before and after laser irradiation by using several techniques (colorimetry, optical microscopy, fibre optical reflectance spectroscopy, FT-IR spectroscopy Attenuated Total Reflectance microscopy and gas chromatography/mass spectrometry), to detect variations in the morphological and physico-chemical properties. The results did not point out significant changes in the sample properties after

  13. Development of a yearlong maintenance-free terawatt Ti:Sapphire laser system with a 3D UV-pulse shaping system for THG

    International Nuclear Information System (INIS)

    Tomizawa, H; Dewa, H; Hanaki, H; Matsui, F

    2007-01-01

    Laser sources that feature a controlled pulse shape and long-term stability are required in a wide range of scientific fields. We developed a maintenance-free 3D-shaped UV-laser system for the photoinjector (RF gun photocathode) of an X-ray SASE free electron laser (FEL). The laser pulse-energy stability was improved to 0.2%-0.3% (rms, 10 pps, 0.4 TW in femtosecond operation) at the fundamental wavelength and to 0.7%-1.4% at the third-harmonic wavelength. This stability was continuously maintained for five months, 24 hours a day. Such improvement reflects an ability to stabilise the laser system in a humidity-controlled clean room. The pulse-energy stability of a mode-locked femtosecond oscillator was continuously held at 0.3% (p-p) for five months, 24 hours a day. In addition, the ideal spatial and temporal profiles of a shot-by-shot single UV-laser pulse are essential to suppress the emittance of the electron-beam pulse generated by the photocathode of the RF gun. We apply a deformable mirror that automatically shapes the spatial UV-laser profile with a feedback routine, based on a genetic algorithm, and a pulse stacker for temporal shaping at the same time. The 3D shape of the laser pulse is spatially top-hat (flattop) and temporally - a square stacked pulse. We apply the Q-scan method to evaluate the emittance of the electron beam generated by a 3D-shaped laser pulse. By using a 3D-shaped laser pulse of diameter 0.8 mm on the cathode and duration 10 ps (FWHM), we obtain a minimum horizontal normalised emittance of 1.4π mm mrad with beam energy of 26 MeV, holding its net charge to a 0.4 nC pulse -1 . At a higher net charge of 1.0 nC pulse -1 , the minimum beam emittance is 2.3π mm mrad with equivalent diameter and a longer pulse duration of 20 ps (FWHM). In this study, we demonstrate 3D shaping [both temporal (1D) and spatial (2D)] short pulse (5-20ps) laser beam as an ideal light source for yearlong stable generation of a low emittance electron beam with a

  14. Manipulation by multiple filamentation of subpicosecond TW KrF laser beam

    Science.gov (United States)

    Zvorykin, V. D.; Smetanin, I. V.; Ustinovskii, N. N.; Shutov, A. V.

    2018-05-01

    A self-focusing of TW-level subpicosecond UV KrF laser pulses in ambient air produces a few 100 randomly distributed filaments over 100-m propagation distance. A control of multiple filamentation process by a number of methods was demonstrated in the present work envisaging applications for a HV discharge guiding, remote excitation of an atmospheric air laser, MW radiation transfer by virtual plasma waveguide, as well as filamentation suppression to improve short pulse parameters in direct amplification scheme. Under the laser beam focusing, a multitude of filaments coalesced into a superfilament with highly increased intensity and plasma conductivity. A superradiant forward lasing was obtained in the superfilament around 1.07-µm wavelength of atmospheric nitrogen. A regular 2D array of a 100 superfilaments was configured over 20-m distance by Fresnel diffraction on periodic amplitude masks. Effective Kerr defocusing and a subsequent filaments suppression over 50-m distance was demonstrated in Xe due to 2-photon resonance of laser radiation with 6p state being accompanied by a narrow-angle coherent conical emission at 828-nm wavelength.

  15. Production of organic compounds in plasmas - A comparison among electric sparks, laser-induced plasmas, and UV light

    Science.gov (United States)

    Scattergood, Thomas W.; Mckay, Christopher P.; Borucki, William J.; Giver, Lawrence P.; Van Ghyseghem, Hilde

    1989-01-01

    In order to ascertain the features of organic compound-production in planetary atmospheres under the effects of plasmas and shocks, various mixtures of N2, CH4, and H2 modeling the atmosphere of Titan were subjected to discrete sparks, laser-induced plasmas, and UV radiation. The experimental results obtained suggest that UV photolysis from the plasma is an important organic compound synthesis process, as confirmed by the photolysis of gas samples that were exposed to the light but not to the shock waves emitted by the sparks. The thermodynamic equilibrium theory is therefore incomplete in the absence of photolysis.

  16. Surface modification induced by UV nanosecond Nd:YVO4 laser structuring on biometals

    Science.gov (United States)

    Fiorucci, M. Paula; López, Ana J.; Ramil, Alberto

    2014-08-01

    Laser surface texturing is a promising tool for improving metallic biomaterials performance in dental and orthopedic bone-replacing applications. Laser ablation modifies the topography of bulk material and might alter surface properties that govern the interactions with the surrounding tissue. This paper presents a preliminary evaluation of surface modifications in two biometals, stainless steel 316L and titanium alloy Ti6Al4V by UV nanosecond Nd:YVO4. Scanning electron microscopy of the surface textured by parallel micro-grooves reveals a thin layer of remelted material along the grooves topography. Furthermore, X-ray diffraction allowed us to appreciate a grain refinement of original crystal structure and consequently induced residual strain. Changes in the surface chemistry were determined by means of X-ray photoelectron spectroscopy; in this sense, generalized surface oxidation was observed and characterization of the oxides and other compounds such hydroxyl groups was reported. In case of titanium alloy, oxide layer mainly composed by TiO2 which is a highly biocompatible compound was identified. Furthermore, laser treatment produces an increase in oxide thickness that could improve the corrosion behavior of the metal. Otherwise, laser treatment led to the formation of secondary phases which might be detrimental to physical and biocompatibility properties of the material.

  17. Mitigation and control of the overcuring effect in mask projection micro-stereolithography

    Science.gov (United States)

    O'Neill, Paul F.; Kent, Nigel; Brabazon, Dermot

    2017-10-01

    Mask Projection micro-Stereolithography (MPμSL) is an additive manufacturing technique capable of producing solid parts with micron-scale resolution from a vat of photocurable liquid polymer resin. Although the physical mechanism remains the same, the process differs from traditional laser-galvanometer based stereolithography (SL) in its use of a dynamic mask UV projector, or digital light processor (DLP), which cures each location within each 3D layer at the same time. One area where MPµSL has garnered considerable attention is in the field of microfluidics and Lab-on-a-Chip, where complex multistep microfabrication techniques adopted from the semiconductor industry are still widely used, and where MPµSL offers the ability to fabricate completely encapsulated fluidic channels in a single step and at low cost [1-3]. However, a significant obstacle exists in the prevention of channel blockage due to overcuring of the polymer resin [4, 5]. Overcuring can be attributed to the so-called `back side effect' [2] which occurs during the build process as light from successive layers penetrates into the resin to a depth greater than the layer thickness. This effect is most prevalent in channels or features oriented horizontally (in a parallel plane to that of the build platform). Currently there are two main approaches in controlling the cure depth; 1. the chemical approach, which involves doping the resin material with a chemical light absorber [6-8]; and 2. by improving the system's hardware and optical elements to improve the homogeneity of the light dosage and control the cure depth [9]. Here we investigate a third approach through modification of the 3D CAD file prior to printing to mitigate for UV light leakage from successive build layers. Although used here in conjunction with the MPμSL technique, this approach can be applied to a range of SL techniques to improve printer resolution and enable production of internal features with higher dimensional accuracy.

  18. Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

    Science.gov (United States)

    Matsuoka, Yoichi; Seki, Junichi; Nakayama, Takahiro; Nakagawa, Kazuki; Azuma, Hisanobu; Yamamoto, Kiyohito; Sato, Chiaki; Sakai, Fumio; Takabayashi, Yukio; Aghili, Ali; Mizuno, Makoto; Choi, Jin; Jones, Chris E.

    2016-10-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

  19. Laser interaction with matter as a source of U.V. and soft X-ray radiation: application to X-ray cinematography

    International Nuclear Information System (INIS)

    Tonon, G.F.; Colombant, Denis; Delmare, Claude; Rabeau, Maxime

    A new detecting device is described. It allows one to get the frequency, the time and space resolution of pictures of U.V. and soft X ray emission of a laser created plasma in a single shot: X ray pictures of such a plasma are presented. After these preliminary results, it is possible to set up readily an X ray framing camera. A laser created plasma is an X ray source of special interest: the emitted power can be 10% of the laser intensity and the emitted spectrum is centered around 1A wavelength [fr

  20. Optimal Focusing and Scaling Law for Uniform Photo-Polymerization in a Thick Medium Using a Focused UV Laser

    Directory of Open Access Journals (Sweden)

    Jui-Teng Lin

    2014-02-01

    Full Text Available We present a modeling study of photoinitiated polymerization in a thick polymer-absorbing medium using a focused UV laser. Transient profiles of the initiator concentration at various focusing conditions are analyzed to define the polymerization boundary. Furthermore, we demonstrate the optimal focusing conditions that yield more uniform polymerization over a larger volume than the collimated or non-optimal cases. Too much focusing with the focal length f < f* (an optimal focal length yields a fast process; however, it provides a smaller polymerization volume at a given time than in the optimal focusing case. Finally, a scaling law is derived and shows that f* is inverse proportional to the product of the extinction coefficient and the initiator initial concentration. The scaling law provides useful guidance for the prediction of optimal conditions for photoinitiated polymerization under a focused UV laser irradiation. The focusing technique also provides a novel and unique means for obtaining uniform photo-polymerization within a limited irradiation time.

  1. [Cleavage of DNA fragments induced by UV nanosecond laser excitation at 193 nm].

    Science.gov (United States)

    Vtiurina, N N; Grokhovskiĭ, S L; Filimonov, I V; Medvedkov, O I; Nechipurenko, D Iu; Vasil'ev, S A; Nechipurenko, Iu D

    2011-01-01

    The cleavage of dsDNA fragments in aqueous solution after irradiation with UV laser pulses at 193 nm has been studied. Samples were investigated using polyacrylamide gel electrophoresis. The intensity of damage of particular phosphodiester bond after hot alkali treatment was shown to depend on the base pair sequence. It was established that the probability of cleavage is twice higher for sites of DNA containing two or more successively running guanine residues. A possible mechanism of damage to the DNA molecule connected with the migration of holes along the helix is discussed.

  2. Test measurements on a secco white-lead containing model samples to assess the effects of exposure to low-fluence UV laser radiation

    Science.gov (United States)

    Raimondi, Valentina; Andreotti, Alessia; Colombini, Maria Perla; Cucci, Costanza; Cuzman, Oana; Galeotti, Monica; Lognoli, David; Palombi, Lorenzo; Picollo, Marcello; Tiano, Piero

    2015-05-01

    Laser-induced fluorescence technique is widely used for diagnostic purposes in several applications and its use could be of advantage for non-invasive on-site characterisation of pigments or other compounds in wall paintings. However, it is well known that long-time exposure to UV and VIS radiation can cause damage to wall paintings. Several studies have investigated the effects of lighting, e.g., in museums: however, the effects of low-fluence laser radiation have not been studied much so far. This paper investigates the effects of UV laser radiation using fluences in the range of 0.1 mJ/cm2-1 mJ/cm2 on a set of a secco model samples prepared with lead white and different type of binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). The samples were irradiated using a Nd:YAG laser (emission wavelength at 355 nm; pulse width: 5 ns) by applying laser fluences between 0.1 mJ/cm2 and 1 mJ/cm2 and a number of laser pulses between 1 and 500. The samples were characterised before and after laser irradiation by using several techniques (colorimetry, optical microscopy, fibre optical reflectance spectroscopy, FT-IR spectroscopy Attenuated Total Reflectance microscopy and gas chromatography/mass spectrometry), to detect variations in the morphological and physico-chemical properties. The results did not point out significant changes in the sample properties after irradiation in the proposed range of laser fluences.

  3. Gain characteristics of a multiatmosphere uv-preionized CO2 laser

    International Nuclear Information System (INIS)

    Alcock, A.J.; Fedosejevs, R.; Walker, A.C.

    1975-01-01

    The small-signal gain of a transverse-discharge UV-preionized CO 2 laser was investigated at pressures in the 1 to 15-atm range. Measurements were carried out on the P(18) and R(16) lines of both the 10.4- and 9.4-μm bands, and data on the pressure dependence of the peak gain and gain rise time are presented. The results demonstrate that small-signal gains in excess of 5-percent cm -1 are readily obtained at pressures of approximately 12 atm and confirm that the relaxation times of the energy levels relevant to laser action scale inversely with pressure. In addition, it is found that the gain of both R branches increases more rapidly with pressure than that of the P branches, while there are indications that the 9.4- and 10.4-μm gain values become comparable at pressures of approximately 15 atm. The experimental results are compared with the dependence of gain on pressure predicted by a relatively simple theoretical model. On the basis of this model it is found that the experimentally determined gain rises more rapidly with pressure than one would expect and a number of possible reasons for this discrepancy are discussed

  4. Properties of Al- and Ga-doped thin zinc oxide films treated with UV laser radiation

    Science.gov (United States)

    Al-Asedy, Hayder J.; Al-Khafaji, Shuruq A.; Bakhtiar, Hazri; Bidin, Noriah

    2018-03-01

    This paper reports the Nd:YAG laser irradiation treated modified properties of aluminum (Al) and gallium (Ga) co-doped zinc oxide (ZnO) (AGZO) films prepared on Si-substrate via combined sol-gel and spin-coating method. The impact of varying laser energy (150-200 mJ) on the structure, morphology, electrical and optical properties of such AGZO films were determined. Laser-treated samples were characterized using various analytical tools. Present techniques could achieve a high-quality polycrystalline films compared with those produced via conventional high temperature processing. AGZO films irradiated with third harmonics UV radiation (355 nm) from Nd:YAG laser source revealed very low resistivity of 4.02 × 10- 3 Ω cm. The structural properties grain size was calculated firm the X-ray diffraction spectra using the Scherrer equation that increased from 12.7 to 22.5 nm as the annealing laser energy increased from (150-200) mJ. The differences in crystallinity and orientation are explained in terms of the thermal effect caused by laser irradiation. (FESEM) images have been demonstrated that Nd:YAG laser annealing can significantly improve the crystallinity level, densification, and surface flatness of sol-gel derived AGZO thin films that occurred as a result of laser processing. Synthesized AGZO films displayed favorable growth orientation along (101) lattice direction. AGZO films with energy band gap of 3.37-3.41 eV were obtained. Results on the crystallinity, surface morphology, roughness, bonding vibration, absorption, photoluminescence, and resistivity of the laser-irradiated films were analyzed and discussed.

  5. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  6. Over 8 W high peak power UV laser with a high power Q-switched Nd:YVO4 oscillator and the compact extra-cavity sum-frequency mixing

    International Nuclear Information System (INIS)

    Yan, X P; Liu, Q; Gong, M; Wang, D S; Fu, X

    2009-01-01

    A 8.2 W UV laser was reported with the compact extra-cavity sum-frequency mixing. The IR fundamental frequency source was a high power and high beam quality Q-switched Nd:YVO 4 oscillator. 38 W fundamental frequency laser at 1064 nm was obtained at the pulse repetition rate of 450 kHz with the beam quality factors of M 2 x = 1.27, M 2 y = 1.21. The type I and type II phase-matched LBO crystals were used as the extra-cavity frequency doubling and mixing crystals respectively. At 38 kHz, 8.2 W UV laser at 355 nm was achieved with the pulse duration of 8 ns corresponding to the pulse peak power as high as 27 kW, and the optical-optical conversion efficiency from IR to UV was 25.6%. The output characteristics of the IR and the harmonic generations varying with the pulse repetition rate were also investigated detailedly

  7. Conformation of L-Tyrosine Studied by Fluorescence-Detected UV-UV and IR-UV Double-Resonance Spectroscopy

    OpenAIRE

    Inokuchi, Yoshiya; Kobayashi, Yusuke; Ito, Takafumi; Ebata, Takayuki

    2007-01-01

    The laser-induced fluorescence spectrum of jet-cooled L-tyrosine exhibits more than 20 vibronic bands in the 35450-35750 cm-1 region. We attribute these bands to eight conformers by using results of UV-UV hole-burning spectroscopy. These isomers are classified into four groups; each group consists of two rotational isomers that have a similar side-chain conformation but different orientations of the phenolic OH. The splitting of band origins of rotational isomers is 31, 21, 5, and 0 cm-1 for ...

  8. Comparative researches concerning cleaning chosen construction materials surface layer using UV and IR laser radiation

    International Nuclear Information System (INIS)

    Napadlek, W.; Marczak, J.; Kubicki, J.; Szudrowicz, M.

    2002-01-01

    The paper presents comparative research studies of cleaning out of deposits and pollution disposals on different constructional materials like; steel, cast iron, aluminium, copper by using UV and IR laser radiation of wavelength λ =1.064 μm; λ = 0.532 μm; λ = 0.355 μm and λ = 0.266 μm and also impulse laser TEA CO 2 at radiation λ = 10.6 μm were used for the experiments. Achieved experimental results gave us basic information on parameters and conditions and application of each used radiation wavelength. Each kind of pollution and base material should be individually treated, selecting the length of wave and radiation energy density. Laser microtreatment allows for broad cleaning application of the surface of constructional materials as well as may be used in future during manufacturing processes as: preparation of surface for PVD technology, galvanotechnics, cleaning of the surface of machine parts etc. (author)

  9. Overlay improvement by exposure map based mask registration optimization

    Science.gov (United States)

    Shi, Irene; Guo, Eric; Chen, Ming; Lu, Max; Li, Gordon; Li, Rivan; Tian, Eric

    2015-03-01

    Along with the increased miniaturization of semiconductor electronic devices, the design rules of advanced semiconductor devices shrink dramatically. [1] One of the main challenges of lithography step is the layer-to-layer overlay control. Furthermore, DPT (Double Patterning Technology) has been adapted for the advanced technology node like 28nm and 14nm, corresponding overlay budget becomes even tighter. [2][3] After the in-die mask registration (pattern placement) measurement is introduced, with the model analysis of a KLA SOV (sources of variation) tool, it's observed that registration difference between masks is a significant error source of wafer layer-to-layer overlay at 28nm process. [4][5] Mask registration optimization would highly improve wafer overlay performance accordingly. It was reported that a laser based registration control (RegC) process could be applied after the pattern generation or after pellicle mounting and allowed fine tuning of the mask registration. [6] In this paper we propose a novel method of mask registration correction, which can be applied before mask writing based on mask exposure map, considering the factors of mask chip layout, writing sequence, and pattern density distribution. Our experiment data show if pattern density on the mask keeps at a low level, in-die mask registration residue error in 3sigma could be always under 5nm whatever blank type and related writer POSCOR (position correction) file was applied; it proves random error induced by material or equipment would occupy relatively fixed error budget as an error source of mask registration. On the real production, comparing the mask registration difference through critical production layers, it could be revealed that registration residue error of line space layers with higher pattern density is always much larger than the one of contact hole layers with lower pattern density. Additionally, the mask registration difference between layers with similar pattern density

  10. Influence of mask type and mask position on the effectiveness of bag-mask ventilation in a neonatal manikin.

    Science.gov (United States)

    Deindl, Philipp; O'Reilly, Megan; Zoller, Katharina; Berger, Angelika; Pollak, Arnold; Schwindt, Jens; Schmölzer, Georg M

    2014-01-01

    Anatomical face mask with an air cushion rim might be placed accidentally in a false orientation on the newborn's face or filled with various amounts of air during neonatal resuscitation. Both false orientation as well as variable filling may reduce a tight seal and therefore hamper effective positive pressure ventilation (PPV). We aimed to measure the influence of mask type and mask position on the effectiveness of PPV. Twenty neonatal staff members delivered PPV to a modified, leak-free manikin. Resuscitation parameters were recorded using a self-inflatable bag PPV with an Intersurgical anatomical air cushion rim face mask (IS) and a size 0/1 Laerdal round face mask. Three different positions of the IS were tested: correct position, 90° and 180° rotation in reference to the midline of the face. IS masks in each correct position on the face but with different inflation of the air cushion (empty, 10, 20 and 30 mL). Mask leak was similar with mask rotation to either 90° or 180° but significantly increased from 27 (13-73) % with an adequate filled IS mask compared to 52 (16-83) % with an emptied air cushion rim. Anatomical-shaped face mask had similar mask leaks compared to round face mask. A wrongly positioned anatomical-shaped mask does not influence mask leak. Mask leak significantly increased once the air cushion rim was empty, which may cause failure in mask PPV.

  11. Coupled optical resonance laser locking

    CSIR Research Space (South Africa)

    Burd, CC

    2014-10-01

    Full Text Available We have demonstrated simultaneous laser frequency stabilization of a UV and IR laser, to coupled transitions of ions in the same spectroscopic sample, by detecting only the absorption of the UV laser. Separate signals for locking the different...

  12. Coherent diffractive imaging using randomly coded masks

    Energy Technology Data Exchange (ETDEWEB)

    Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); D' Aspremont, Alexandre [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Turner, Joshua J. [Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

    2015-12-07

    We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments.

  13. Immuno-magnetic beads-based extraction-capillary zone electrophoresis-deep UV laser-induced fluorescence analysis of erythropoietin.

    Science.gov (United States)

    Wang, Heye; Dou, Peng; Lü, Chenchen; Liu, Zhen

    2012-07-13

    Erythropoietin (EPO) is an important glycoprotein hormone. Recombinant human EPO (rhEPO) is an important therapeutic drug and can be also used as doping reagent in sports. The analysis of EPO glycoforms in pharmaceutical and sports areas greatly challenges analytical scientists from several aspects, among which sensitive detection and effective and facile sample preparation are two essential issues. Herein, we investigated new possibilities for these two aspects. Deep UV laser-induced fluorescence detection (deep UV-LIF) was established to detect the intrinsic fluorescence of EPO while an immuno-magnetic beads-based extraction (IMBE) was developed to specifically extract EPO glycoforms. Combined with capillary zone electrophoresis (CZE), CZE-deep UV-LIF allows high resolution glycoform profiling with improved sensitivity. The detection sensitivity was improved by one order of magnitude as compared with UV absorbance detection. An additional advantage is that the original glycoform distribution can be completely preserved because no fluorescent labeling is needed. By combining IMBE with CZE-deep UV-LIF, the overall detection sensitivity was 1.5 × 10⁻⁸ mol/L, which was enhanced by two orders of magnitude relative to conventional CZE with UV absorbance detection. It is applicable to the analysis of pharmaceutical preparations of EPO, but the sensitivity is insufficient for the anti-doping analysis of EPO in blood and urine. IMBE can be straightforward and effective approach for sample preparation. However, antibodies with high specificity were the key for application to urine samples because some urinary proteins can severely interfere the immuno-extraction. Copyright © 2012 Elsevier B.V. All rights reserved.

  14. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  15. venice: Mask utility

    Science.gov (United States)

    Coupon, Jean

    2018-02-01

    venice reads a mask file (DS9 or fits type) and a catalogue of objects (ascii or fits type) to create a pixelized mask, find objects inside/outside a mask, or generate a random catalogue of objects inside/outside a mask. The program reads the mask file and checks if a point, giving its coordinates, is inside or outside the mask, i.e. inside or outside at least one polygon of the mask.

  16. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    DEFF Research Database (Denmark)

    Kehagias, N.; Reboud, V.; Chansin, G.

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer...... are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed...... polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three...

  17. Photoacoustic study of curing time by UV laser radiation of a photoresin with different thickness

    Energy Technology Data Exchange (ETDEWEB)

    Pincel, P. Vieyra [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico); Jiménez-Pérez, J.L., E-mail: jimenezp@fis.cinvestav.mx [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico); Cruz-Orea, A. [Departamento de Física, CINVESTAV-IPN, Av. Instituto Politécnico Nacional 2508, Col. San Pedro Zacatenco, C.P. 07360 México, D.F. (Mexico); Correa-Pacheco, Z.N. [Instituto Politécnico Nacional-Centro de Desarrollo de Productos Bióticos (CEPROBI). Carr. Yautepec–Jojutla, km 6. San Isidro, C.P. 62730 Yautepec, Morelos (Mexico); Rosas, J. Hernández [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico)

    2015-04-20

    Highlights: • The curing of a resin in the presence of a UV laser radiation was studied. • Open photoacoustic cell technique was used to characterize the curing of the resin. • The curing of the resin as a function of time was studied. • A parabolic behavior of the resin thickness, as a function of time was observed. • UV–vis and FTIR spectroscopy were employed to characterize the resin. - Abstract: This paper deals with the study of the cure of a resin in the presence of a UV laser radiation used as the excitation source, operated at λ = 405 nm, with an output power of 20 mW. The open photoacoustic cell (OPC) technique was used to study the curing of the resins as a function of time. The curing characteristic time values were τ = 10.43, 20.99, 30.18, 45.84, 67.59 and 89.55 s for the resin thicknesses of 1000, 2000, 3000, 4000, 5000 and 6000 μm, respectively. A parabolic behavior of the resin thickness, as a function of the curing characteristic time, was obtained. UV–vis spectroscopy and infrared Fourier transform spectroscopy (FTIR) techniques were employed to characterize the resin in order to study the optical absorption and the chemical bonds, respectively. Our work has applications in the manufacture of 3D printing parts for applications, among others, in medicine.

  18. Photoacoustic study of curing time by UV laser radiation of a photoresin with different thickness

    International Nuclear Information System (INIS)

    Pincel, P. Vieyra; Jiménez-Pérez, J.L.; Cruz-Orea, A.; Correa-Pacheco, Z.N.; Rosas, J. Hernández

    2015-01-01

    Highlights: • The curing of a resin in the presence of a UV laser radiation was studied. • Open photoacoustic cell technique was used to characterize the curing of the resin. • The curing of the resin as a function of time was studied. • A parabolic behavior of the resin thickness, as a function of time was observed. • UV–vis and FTIR spectroscopy were employed to characterize the resin. - Abstract: This paper deals with the study of the cure of a resin in the presence of a UV laser radiation used as the excitation source, operated at λ = 405 nm, with an output power of 20 mW. The open photoacoustic cell (OPC) technique was used to study the curing of the resins as a function of time. The curing characteristic time values were τ = 10.43, 20.99, 30.18, 45.84, 67.59 and 89.55 s for the resin thicknesses of 1000, 2000, 3000, 4000, 5000 and 6000 μm, respectively. A parabolic behavior of the resin thickness, as a function of the curing characteristic time, was obtained. UV–vis spectroscopy and infrared Fourier transform spectroscopy (FTIR) techniques were employed to characterize the resin in order to study the optical absorption and the chemical bonds, respectively. Our work has applications in the manufacture of 3D printing parts for applications, among others, in medicine

  19. Interactions of acetylated histones with DNA as revealed by UV laser induced histone-DNA crosslinking

    International Nuclear Information System (INIS)

    Stefanovsky, V.Yu.; Dimitrov, S.I.; Angelov, D.; Pashev, I.G.

    1989-01-01

    The interaction of acetylated histones with DNA in chromatin has been studied by UV laser-induced crosslinking histones to DNA. After irradiation of the nuclei, the covalently linked protein-DNA complexes were isolated and the presence of histones in them demonstrated immunochemically. When chromatin from irradiated nuclei was treated with clostripain, which selectively cleaved the N-terminal tails of core histones, no one of them was found covalently linked to DNA, thus showing that crosslinking proceeded solely via the N-terminal regions. However, the crosslinking ability of the laser was preserved both upon physiological acetylation of histones, known to be restricted to the N-terminal tails, and with chemically acetylated chromatin. This finding is direct evidence that the postsynthetic histone acetylation does not release the N-terminal tails from interaction with DNA

  20. Study on the surface chemical properties of UV excimer laser irradiated polyamide by XPS, ToF-SIMS and CFM

    International Nuclear Information System (INIS)

    Yip, Joanne; Chan, Kwong; Sin, Kwan Moon; Lau, Kai Shui

    2002-01-01

    Polyamide (nylon 6) was irradiated by a pulsed ultraviolet (UV) excimer laser with a fluence below its ablation threshold. Chemical modifications on laser treated nylon were studied by X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (Tof-SIMS) and chemical force microscopy (CFM). XPS study provides information about changes in chemical composition and the chemical-state of atom types on the fiber surface. The high sensitivity of ToF-SIMS to the topmost layers was used to detect crosslinking after the laser treatment. Gold-coated AFM tips modified with -COOH terminated self-assembled alkanethiol monolayers (SAMs) were used to measure adhesion forces on the untreated and laser treated samples. XPS results revealed that the irradiated samples have higher oxygen content than prior to laser irradiation. Tof-SIMS analysis illustrated that carbonyl groups in nylon 6 decrease significantly but hydroxyl groups increase after low-fluence laser irradiation. The adhesion force measurements by CFM showed spatial distribution of hydroxyl groups on nylon 6 after the laser treatment

  1. UV-laser-based microscopic dissection of tree rings - a novel sampling tool for δ(13) C and δ(18) O studies.

    Science.gov (United States)

    Schollaen, Karina; Heinrich, Ingo; Helle, Gerhard

    2014-02-01

    UV-laser-based microscopic systems were utilized to dissect and sample organic tissue for stable isotope measurements from thin wood cross-sections. We tested UV-laser-based microscopic tissue dissection in practice for high-resolution isotopic analyses (δ(13) C/δ(18) O) on thin cross-sections from different tree species. The method allows serial isolation of tissue of any shape and from millimetre down to micrometre scales. On-screen pre-defined areas of interest were automatically dissected and collected for mass spectrometric analysis. Three examples of high-resolution isotopic analyses revealed that: in comparison to δ(13) C of xylem cells, woody ray parenchyma of deciduous trees have the same year-to-year variability, but reveal offsets that are opposite in sign depending on whether wholewood or cellulose is considered; high-resolution tree-ring δ(18) O profiles of Indonesian teak reflect monsoonal rainfall patterns and are sensitive to rainfall extremes caused by ENSO; and seasonal moisture signals in intra-tree-ring δ(18) O of white pine are weighted by nonlinear intra-annual growth dynamics. The applications demonstrate that the use of UV-laser-based microscopic dissection allows for sampling plant tissue at ultrahigh resolution and unprecedented precision. This new technique facilitates sampling for stable isotope analysis of anatomical plant traits like combined tree eco-physiological, wood anatomical and dendroclimatological studies. © 2013 The Authors. New Phytologist © 2013 New Phytologist Trust.

  2. Development and Quantification of UV-Visible and Laser Spectroscopic Techniques for Materials Accountability and Process Control

    International Nuclear Information System (INIS)

    Czerwinski, Ken; Weck, Phil; Poineau, Frederic

    2010-01-01

    Ultraviolet-Visible Spectroscopy (UV-Visible) and Time Resolved Laser Fluorescence Spectroscopy (TRLFS) optical techniques can permit on-line, real-time analysis of the actinide elements in a solvent extraction process. UV-Visible and TRLFS techniques have been used for measuring the speciation and concentration of the actinides under laboratory conditions. These methods are easily adaptable to multiple sampling geometries, such as dip probes, fiber-optic sample cells, and flow-through cell geometries. To fully exploit these techniques for GNEP applications, the fundamental speciation of the target actinides and the resulting influence on 3 spectroscopic properties must be determined. Through this effort detection limits, process conditions, and speciation of key actinide components can be establish and utilized in a range of areas of interest to GNEP, especially in areas related to materials accountability and process control.

  3. Rates of initial acceptance of PAP masks and outcomes of mask switching.

    Science.gov (United States)

    Bachour, Adel; Vitikainen, Pirjo; Maasilta, Paula

    2016-05-01

    Recently, we noticed a considerable development in alleviating problems related to positive airway pressure (PAP) masks. In this study, we report on the initial PAP mask acceptance rates and the effects of mask switching on mask-related symptoms. We prospectively collected all cases of mask switching in our sleep unit for a period of 14 months. At the time of the study, we used ResMed™ CPAP devices and masks. Mask switching was defined as replacing a mask used for at least 1 day with another type of mask. Changing to a different size but keeping the same type of mask did not count as mask switching. Switching outcomes were considered failed if the initial problem persisted or reappeared during the year that followed switching. Our patient pool was 2768. We recorded 343 cases of mask switching among 267 patients. Of the 566 patients who began new PAP therapy, 108 (39 women) had switched masks, yielding an initial mask acceptance rate of 81 %. The reason for switching was poor-fit/uncomfortable mask in 39 %, leak-related in 30 %, outdated model in 25 %, and nasal stuffiness in 6 % of cases; mask switching resolved these problems in 61 %. Mask switching occurred significantly (p = 0.037) more often in women and in new PAP users. The odds ratio for abandoning PAP therapy within 1 year after mask switching was 7.2 times higher (interval 4.7-11.1) than not switching masks. The initial PAP mask acceptance rate was high. Patients who switched their masks are at greater risk for abandoning PAP therapy.

  4. Investigation of uv N/sub 2/ laser

    Energy Technology Data Exchange (ETDEWEB)

    Jin, Y; Li, Y; Yeh, Y; Lu, C; Wang, B; Hsiang, Z

    1979-02-01

    By applying the theory of nitrogen molecular laser and the electric circuit theory of a Blumlein structure horizontal discharge pulsed laser, a compact N/sub 2/ laser has been developed with improved spark gap switch, transmission line and laser cavity. This laser is particularly suited to serve as a pumping light source for a dye laser. Experimental studies were performed to determine the laser output characteristics as affected by the following parameters: the electric inductance of laser cavity, the shape of the electrode, the electric inductance of spark gap, the transmission line, and the initial point of discharge.

  5. Use of laser-UV for inactivation of virus in blood products

    International Nuclear Information System (INIS)

    Prodouz, K.N.; Fratantoni, J.C.; Boone, E.J.; Bonner, R.F.

    1987-01-01

    Inactivation of virus by UV radiation was examined as a potential method for sterilization of blood products. Samples of attenuated poliovirus, platelets and plasma were uniformly irradiated with a XeCl excimer laser that delivered 40 nsec pulses of UV at 308 nm (UVB308). Intensities and exposure does were varied from 0.11 to 1.40 MW/cm2 and 0.51 to 56.0 J/cm2, respectively. In studies conducted with low intensity UVB308 (less than or equal to 0.17 MW/cm2), using exposure doses greater than or equal to 10.8 J/cm2, it was possible to inactivate poliovirus by 4 to 6 log10. Platelets irradiated with doses less than or equal to 21.5 J/cm2 exhibited minimal damage as assessed by aggregation activity and spontaneous release of serotonin. Examination of the coagulation activity of irradiated plasma indicated that exposure doses less than or equal to 21.5 J/cm2 resulted in less than 20% increase in prothrombin and partial thromboplastin times. The use of UVB308 at a higher intensity (1.4 MW/cm2) over a similar range of exposure doses did not enhance viral inactivation but did result in increased damage to platelet and plasma proteins. These results demonstrate that at 308 nm there exists a window of efficacy for exposure doses between 10.8 and 21.5 J/cm2 and peak intensities less than or equal to 0.17 MW/cm2 in which a hardy virus is significantly inactivated and platelets and plasma proteins are, by functional criteria, minimally affected. Increased viral inactivation cannot be accomplished with higher UV intensities and will require additional or alternate measures

  6. [Alternatives to femtosecond laser technology: subnanosecond UV pulse and ring foci for creation of LASIK flaps].

    Science.gov (United States)

    Vogel, A; Freidank, S; Linz, N

    2014-06-01

    In refractive corneal surgery femtosecond (fs) lasers are used for creating LASIK flaps, dissecting lenticules and for astigmatism correction by limbal incisions. Femtosecond laser systems are complex and expensive and cutting precision is compromised by the large focal length associated with the commonly used infrared (IR) wavelengths. Based on investigations of the cutting dynamics, novel approaches for corneal dissection using ultraviolet A (UVA) picosecond (ps) pulses and ring foci from vortex beams are presented. Laser-induced bubble formation in corneal stroma was investigated by high-speed photography at 1-50 million frames/s. Using Gaussian and vortex beams of UVA pulses with durations between 200 and 850 ps the laser energy needed for easy removal of flaps created in porcine corneas was determined and the quality of the cuts by scanning electron microscopy was documented. Cutting parameters for 850 ps are reported also for rabbit eyes. The UV-induced and mechanical stress were evaluated for Gaussian and vortex beams. The results show that UVA picosecond lasers provide better cutting precision than IR femtosecond lasers, with similar processing times. Cutting energy decreases by >50 % when the laser pulse duration is reduced to 200 ps. Vortex beams produce a short, donut-shaped focus allowing efficient and precise dissection along the corneal lamellae which results in a dramatic reduction of the absorbed energy needed for cutting and of mechanical side effects as well as in less bubble formation in the cutting plane. A combination of novel approaches for corneal dissection provides the option to replace femtosecond lasers by compact UVA microchip laser technology. Ring foci are also of interest for femtosecond laser surgery, especially for improved lenticule excision.

  7. Low-level laser therapy: Effects on human face aged skin and cell viability of HeLa cells exposed to UV radiation

    Directory of Open Access Journals (Sweden)

    Mezghani Sana

    2015-01-01

    Full Text Available Chronic and excessive exposure to UV radiation leads to photoaging and photocarcinogenesis. Adequate protection of the skin against the deleterious effects of UV irradiation is essential. Low-level laser therapy (LLLT is a light source in the red to near-infrared range that has been accepted in a variety of medical applications. In this study, we explored the effect of LLLT in human face aged skin and the cell viability of HeLa cells exposed to UV radiation. We found that LLLT significantly reduced visible wrinkles and the loss of firmness of facial skin in aging subjects. Additionally, treatment of cultured HeLa cells with LLLT prior to or post UVA or UVB exposure significantly protected cells from UV-mediated cell death. All results showed the beneficial effects of LLLT on relieving signs of skin aging and its prevention and protection of the cell viability against UV-induced damage.

  8. UV-laser treatment of nanodiamond seeds - a valuable tool for modification of nanocrystalline diamond films properties

    International Nuclear Information System (INIS)

    Vlček, J; Fitl, P; Vrňata, M; Fekete, L; Taylor, A; Fendrych, F

    2013-01-01

    This work aimed to study the UV-laser treatment of precursor (i.e. nanodiamond (ND) seeds on silicon substrates) and its influence on the properties of grown nanocrystalline diamond (NCD) films. Pulsed Nd:YAG laser operating at the fourth harmonic frequency (laser fluence E L = 250 mJ cm -2 , pulse duration 5 ns) was used as a source, equipped with an optical system for focusing laser beam onto the sample, allowing exposure of a local spot and horizontal patterning. The variable parameters were: number of pulses (from 5 to 400) and the working atmosphere (He, Ar and O 2 ). Ablation and/or graphitization of seeded nanodiamond particles were observed. Further the microwave plasma-enhanced chemical vapour deposition was employed to grow NCD films on exposed and non-exposed areas of silicon substrates. The size, shape and density distribution of laser-treated nanodiamond seeds were observed by atomic force microscopy (AFM) and their chemical composition by x-ray photoelectron spectroscopy (XPS) analysis. The resulting NCD films (uniform thickness of 400 nm) were characterized by: Raman spectroscopy to analyse occurrence of graphitic phase, and AFM to observe morphology and surface roughness. The highest RMS roughness (∼85 nm) was achieved when treating the precursor in He atmosphere. Horizontal microstructures of diamond films were fabricated.

  9. Soft-Matter Printed Circuit Board with UV Laser Micropatterning.

    Science.gov (United States)

    Lu, Tong; Markvicka, Eric J; Jin, Yichu; Majidi, Carmel

    2017-07-05

    When encapsulated in elastomer, micropatterned traces of Ga-based liquid metal (LM) can function as elastically deformable circuit wiring that provides mechanically robust electrical connectivity between solid-state elements (e.g., transistors, processors, and sensor nodes). However, LM-microelectronics integration is currently limited by challenges in rapid fabrication of LM circuits and the creation of vias between circuit terminals and the I/O pins of packaged electronics. In this study, we address both with a unique layup for soft-matter electronics in which traces of liquid-phase Ga-In eutectic (EGaIn) are patterned with UV laser micromachining (UVLM). The terminals of the elastomer-sealed LM circuit connect to the surface mounted chips through vertically aligned columns of EGaIn-coated Ag-Fe 2 O 3 microparticles that are embedded within an interfacial elastomer layer. The processing technique is compatible with conventional UVLM printed circuit board (PCB) prototyping and exploits the photophysical ablation of EGaIn on an elastomer substrate. Potential applications to wearable computing and biosensing are demonstrated with functional implementations in which soft-matter PCBs are populated with surface-mounted microelectronics.

  10. Analysis of material modifications caused by nanosecond pulsed UV laser processing of SiC and GaN

    Energy Technology Data Exchange (ETDEWEB)

    Krueger, Olaf; Wernicke, Tim; Wuerfl, Joachim; Traenkle, Guenther [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Berlin (Germany); Hergenroeder, Roland [ISAS-Institute for Analytical Sciences, Dortmund (Germany)

    2008-10-15

    The effects of direct UV laser processing on single crystal SiC in ambient air were investigated by cross-sectional transmission electron microscopy, Auger electron spectroscopy, and measurements of the electrical resistance using the transfer length method (TLM). Scanning electron microscopy was applied to study the morphology and dimensions of the laser-treated regions. After laser processing using a nanosecond pulsed solid-state laser the debris consisting of silicon oxide was removed by etching in buffered hydrofluoric acid. A layer of resolidified material remains at the surface indicating the thermal impact of the laser process. The Si/C ratio is significantly disturbed at the surface of the resolidified layer and approaches unity in a depth of several tens of nanometers. A privileged oxidation of carbon leaves elementary resolidified silicon at the surface, where nanocrystalline silicon was detected. Oxygen and nitrogen were detected near the surface down to a depth of some tens of nanometers. A conductive surface film is formed, which is attributed to the thermal impact causing the formation of the silicon-rich surface layer and the incorporation of nitrogen as dopant. No indications for microcrack or defect formation were found beneath the layer of resolidified material. (orig.)

  11. Controlled UV-C light-induced fusion of thiol-passivated gold nanoparticles.

    Science.gov (United States)

    Pocoví-Martínez, Salvador; Parreño-Romero, Miriam; Agouram, Said; Pérez-Prieto, Julia

    2011-05-03

    Thiol-passivated gold nanoparticles (AuNPs) of a relatively small size, either decorated with chromophoric groups, such as a phthalimide (Au@PH) and benzophenone (Au@BP), or capped with octadecanethiol (Au@ODCN) have been synthesized and characterized by NMR and UV-vis spectroscopy as well as transmission electron microscopy (TEM). These NPs were irradiated in chloroform at different UV-wavelengths using either a nanosecond laser (266 and 355 nm, ca. 12 mJ/pulse, 10 ns pulse) or conventional lamps (300 nm UV-vis spectroscopy, as well as by TEM. Laser irradiation at 355 nm led to NP aggregation and precipitation, while the NPs were photostable under UV-A lamp illumination. Remarkably, laser excitation at 266 nm induced a fast (minutes time-scale) increase in the size of the NPs, producing huge spherical nanocrystals, while lamp-irradiation at UV-C wavelengths brought about nanonetworks of partially fused NPs with a larger diameter than the native NPs.

  12. A simple method of fabricating mask-free microfluidic devices for biological analysis.

    KAUST Repository

    Yi, Xin; Kodzius, Rimantas; Gong, Xiuqing; Xiao, Kang; Wen, Weijia

    2010-01-01

    We report a simple, low-cost, rapid, and mask-free method to fabricate two-dimensional (2D) and three-dimensional (3D) microfluidic chip for biological analysis researches. In this fabrication process, a laser system is used to cut through paper

  13. Lasers, extreme UV and soft X-ray

    Energy Technology Data Exchange (ETDEWEB)

    Nilsen, Joseph [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA) laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.

  14. Production of spectrally reconstructed uv-radiation by means of a nonlinear conversion of the generation frequency of a dye laser with lamp pumping

    Energy Technology Data Exchange (ETDEWEB)

    Anufrik, S S; Mostovnikov, V A; Rubinov, A N

    1976-03-01

    By doubling the generation frequency of an organic dye laser with lamp pumping, radiation is obtained in the spectral region of 285 to 305 nm. Depending on the mode of operation of a given laser the spectral width of the uv-radiation was 0.5 or approximately 0.003 nm. The maximum energy of second harmonic pulses was equal to approximately 0.01 J. (SJR)

  15. The implementation of Mask-Ed: reflections of academic participants.

    Science.gov (United States)

    Reid-Searl, Kerry; Levett-Jones, Tracy; Cooper, Simon; Happell, Brenda

    2014-09-01

    This paper profiles the findings from a study that explored the perspectives and experiences of nurse educators who implemented a novel simulation approach termed Mask-Ed. The technique involves the educator wearing a silicone mask and or body parts and transforming into a character. The premise of this approach is that the masked educator has domain specific knowledge related to the simulation scenario and can transmit this to learners in a way that is engaging, realistic, spontaneous and humanistic. Nurse educators charged with the responsibility of implementing Mask-Ed in three universities were invited to participate in the study by attending an introductory workshop, implementing the technique and then journaling their experiences, insights and perspectives over a 12 month period. The journal entries were then thematically analysed. Key themes were categorised under the headings of Preparation, Implementation and Impact; Reflexivity and Responsiveness; Student Engagement and Ownership; and Teaching and Learning. Mask-Ed is a simulation approach which allows students to interact with the 'characters' in humanistic ways that promote person-centred care and therapeutic communication. This simulation approach holds previously untapped potential for a range of learning experiences, however, to be effective, adequate resourcing, training, preparation and practice is required. Copyright © 2014 Elsevier Ltd. All rights reserved.

  16. Preparation of inorganic crystalline compounds induced by ionizing, UV and laser radiation

    International Nuclear Information System (INIS)

    Cuba, V.; Pavelkova, T.; Barta, J.; Indrei, J.; Gbur, T.; Pospisil, M.; Mucka, V.; Docekalova, Z.; Zavadilova, A.; Vlk, M.

    2011-01-01

    Complete text of publication follows. Radiation methods represent powerful tool for synthesis of various inorganic materials. Study of solid particles formation from solutions in the field of UV or ionizing radiation is one of the very promising and long term pursued trends in photochemistry and radiation chemistry. The motivation may be various, either preparation of new materials or removal of hazardous contaminants (e.g. heavy metals) from wastewater. This work deals with preparation of some metal oxides, synthetic garnets and spinel structures via irradiation of aqueous solutions containing precursors, i.e. soluble metal salts, radical scavengers and/or macromolecular stabilizers. Namely, results on radiation induced preparation of nickel, zinc, yttrium and aluminium oxides are summarized, as well as zinc peroxide, yttrium / lutetium - aluminium garnets and cobalt(II) aluminate. 60 Co irradiator, linear electron accelerator, medium pressure UV lamp and solid state laser were used as the sources of radiation. Aside from preparation, various physico-chemical and structural properties of compounds prepared were also studied. All used modifications of radiation method are rather convenient and simple, and yield (nano)powder materials with interesting characteristics. Prepared materials generally have high chemical purity, high specific surface area and narrow distribution of particles size (ranging in tens of nm). Generally, all types of irradiation result in materials with comparable properties and structural characteristics; but in the case of synthetic garnets and spinels, preparation using UV-radiation seems to be the most convenient for their preparation. Among compounds discussed, only zinc oxide and zinc peroxide were prepared directly via irradiation. For preparation of other crystalline compounds, additional heat treatment (at low temperature) of amorphous solid phase formed under irradiation was necessary.

  17. Improved patterning of ITO coated with gold masking layer on glass substrate using nanosecond fiber laser and etching

    International Nuclear Information System (INIS)

    Tan, Nguyen Ngoc; Hung, Duong Thanh; Anh, Vo Tran; BongChul, Kang; HyunChul, Kim

    2015-01-01

    Highlights: • A new patterning method for ITO thin film is introduced. • Gold thin film is important in decrease spikes formed in ITO patterning process. • The laser pulse width occupies a significant effect the patterning surface quality. • Etching process is the effective method to remove the spikes at rims of pattern. • A considerable improvement over patterning quality is obtained by proposed method. - Abstract: In this paper, an indium–tin oxide (ITO) thin-film patterning method for higher pattern quality and productivity compared to the short-pulsed laser direct writing method is presented. We sputtered a thin ITO layer on a glass substrate, and then, plated a thin gold layer onto the ITO layer. The combined structure of the three layers (glass–ITO–gold) was patterned using laser-induced plasma generated by an ytterbium pulsed fiber laser (λ = 1064 nm). The results showed that the process parameters of 50 mm/s in scanning speed, 14 ns pulse duration, and a repetition rate of 7.5 kHz represented optimum conditions for the fabrication of ITO channels. Under these conditions, a channel 23.4 μm wide and 20 nm deep was obtained. However, built-up spikes (∼15 nm in height) resulted in a decrease in channel quality, and consequently, short circuit occurred at some patterned positions. These built-up spikes were completely removed by dipping the ITO layer into an etchant (18 wt.% HCl). A gold masking layer on the ITO surface was found to increase the channel surface quality without any decrease in ITO thickness. Moreover, the effects of repetition rate, scanning speed, and etching characteristics on surface quality were investigated

  18. Improved patterning of ITO coated with gold masking layer on glass substrate using nanosecond fiber laser and etching

    Energy Technology Data Exchange (ETDEWEB)

    Tan, Nguyen Ngoc; Hung, Duong Thanh; Anh, Vo Tran [High Safety Vehicle Core Technology Research Center, Department of Mechanical & Automotive Engineering, Inje University, Gimhae (Korea, Republic of); BongChul, Kang, E-mail: kbc@kumoh.ac.kr [Department of Inteligent Mechanical Engineering, Kumoh National Institute of Technology, Gumi (Korea, Republic of); HyunChul, Kim, E-mail: mechkhc@inje.ac.kr [High Safety Vehicle Core Technology Research Center, Department of Mechanical & Automotive Engineering, Inje University, Gimhae (Korea, Republic of)

    2015-05-01

    Highlights: • A new patterning method for ITO thin film is introduced. • Gold thin film is important in decrease spikes formed in ITO patterning process. • The laser pulse width occupies a significant effect the patterning surface quality. • Etching process is the effective method to remove the spikes at rims of pattern. • A considerable improvement over patterning quality is obtained by proposed method. - Abstract: In this paper, an indium–tin oxide (ITO) thin-film patterning method for higher pattern quality and productivity compared to the short-pulsed laser direct writing method is presented. We sputtered a thin ITO layer on a glass substrate, and then, plated a thin gold layer onto the ITO layer. The combined structure of the three layers (glass–ITO–gold) was patterned using laser-induced plasma generated by an ytterbium pulsed fiber laser (λ = 1064 nm). The results showed that the process parameters of 50 mm/s in scanning speed, 14 ns pulse duration, and a repetition rate of 7.5 kHz represented optimum conditions for the fabrication of ITO channels. Under these conditions, a channel 23.4 μm wide and 20 nm deep was obtained. However, built-up spikes (∼15 nm in height) resulted in a decrease in channel quality, and consequently, short circuit occurred at some patterned positions. These built-up spikes were completely removed by dipping the ITO layer into an etchant (18 wt.% HCl). A gold masking layer on the ITO surface was found to increase the channel surface quality without any decrease in ITO thickness. Moreover, the effects of repetition rate, scanning speed, and etching characteristics on surface quality were investigated.

  19. Stability of iodinated contrast media in UV-laser irradiation and toxicity of photoproducts

    International Nuclear Information System (INIS)

    Groenewaeller, E.F.; Kehlbach, R.; Claussen, C.D.; Duda, S.H.; Wahl, H.G.; Rodemann, H.P.

    1998-01-01

    Purpose: In XeCl-Excimer laser angioplasty, unintended and possibly harmful interaction of the UV-laser light and the contrast media may occur due to the high concentration of contrast medium proximal to the occlusion or subtotal stenosis. Methods: One ml of three nonionic monomeric contrast agents (iopromide, iomeprol, iopamidol), one nonionic dimetric (jotrolane), and one ionic monomeric (amidotrizoate) X-ray contrast agent were irradiated with a XeCl excimer laser (λ=308 nm, pulse duration 120 ns, 50 Hz) using a 9 French multifiber catheter (12 sectors). Up to 20 000 pulses (106 J) were applied. Using high performance liquid chromatography the amount of liberated iodide as well as the fraction of unchanged contrast media were measured. Cytotoxicity of the photoproducts was tested in a colony formation assay of human skin fibroblasts. The contrast agents were irradiated with 2000 pulses/ml (5.3 mJ/pulse; 10.6 J) and then added to the cell cultures for a period of three hours in a concentration of 10%. Results: Excimer laser irradiation induced iodide liberation of up to 3.3 mg iodide/ml. Up to 19% of the contrast agents changed their original molecular structure. Incubation of irradiated contrast agents resulted in a significantly decreased potential for colony formation (p values ranging from 0.0044 to 0.0102) with significantly higher toxicity of amidotrizoate and iomeprol in comparison to iopromide, iotrolan, and iopamidol. Discussion: Due to the cytotoxic photoproducts and the high level of liberated iodide, it is recommended to flush the artery with physiological saline solution before applying a pulsed excimer laser in human arterial obstructions in order to reduce the contrast agent concentration at the site of irradiation. (orig.) [de

  20. Analysis of materials modifications caused by UV laser micro drilling of via holes in AlGaN/GaN transistors on SiC

    Energy Technology Data Exchange (ETDEWEB)

    Wernicke, Tim [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany)]. E-mail: tim.wernicke@fbh-berlin.de; Krueger, Olaf [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany); Herms, Martin [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany); Wuerfl, Joachim [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany); Kirmse, Holm [Humboldt-Universitaet zu Berlin, Institut fuer Physik, AG Kristallographie, Newtonstr. 15, 12489 Berlin (Germany); Neumann, Wolfgang [Humboldt-Universitaet zu Berlin, Institut fuer Physik, AG Kristallographie, Newtonstr. 15, 12489 Berlin (Germany); Behm, Thomas [Technische Universitaet Bergakademie Freiberg, Institut fuer Theoretische Physik, Bernhard-von-Cotta-Str. 4, 09596 Freiberg (Germany); Irmer, Gert [Technische Universitaet Bergakademie Freiberg, Institut fuer Theoretische Physik, Bernhard-von-Cotta-Str. 4, 09596 Freiberg (Germany); Traenkle, Guenther [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin (Germany)

    2007-07-31

    Pulsed UV laser drilling can be applied to fabricate vertical electrical interconnects (vias) for AlGaN/GaN high electron mobility transistor devices on single-crystalline silicon carbide (SiC) substrate. Through-wafer micro holes with a diameter of 50-100 {mu}m were formed in 400 {mu}m thick bulk 4H-SiC by a frequency-tripled solid-state laser (355 nm) with a pulse width of {<=}30 ns and a focal spot size of {approx}15 {mu}m. The impact of laser machining on the material system in the vicinity of micro holes was investigated by means of micro-Raman spectroscopy and transmission electron microscopy. After removing the loosely deposited debris by etching in buffered hydrofluoric acid, a layer of <4 {mu}m resolidified material remains at the side walls of the holes. The thickness of the resolidified layer depends on the vertical distance to the hole entry as observed by scanning electron microscopy. Micro-Raman spectra indicate a change of internal strain due to laser drilling and evidence the formation of nanocrystalline silicon (Si). Microstructure analysis of the vias' side walls using cross sectional TEM reveals altered degree of crystallinity in SiC. Layers of heavily disturbed SiC, and nanocrystalline Si are formed by laser irradiation. The layers are separated by 50-100 nm thick interface regions. No evidence of extended defects, micro cracking or crystal damage was found beneath the resolidified layer. The precision of UV laser micro ablation of SiC using nanosecond pulses is not limited by laser-induced extended crystal defects.

  1. Comparison of face masks in the bag-mask ventilation of a manikin.

    Science.gov (United States)

    Redfern, D; Rassam, S; Stacey, M R; Mecklenburgh, J S

    2006-02-01

    We conducted a study investigating the effectiveness of four face mask designs in the bag-mask ventilation of a special manikin adapted to simulate a difficult airway. Forty-eight anaesthetists volunteered to bag-mask ventilate the manikin for 3 min with four different face masks. The primary outcome of the study was to calculate mean percentage leak from the face masks over 3 min. Anaesthetists were also asked to rate the face masks using a visual analogue score. The single-use scented intersurgical face mask had the lowest mean leak (20%). This was significantly lower than the mean leak from the single-use, cushioned 7,000 series Air Safety Ltd. face mask (24%) and the reusable silicone Laerdal face mask (27%) but not significantly lower than the mean leak from the reusable anatomical intersurgical face mask (23%). There was a large variation in both performance and satisfaction between anaesthetists with each design. This highlights the importance of having a variety of face masks available for emergency use.

  2. Quantum coherent π-electron rotations in a non-planar chiral molecule induced by using a linearly polarized UV laser pulse

    Science.gov (United States)

    Mineo, Hirobumi; Fujimura, Yuichi

    2015-06-01

    We propose an ultrafast quantum switching method of π-electron rotations, which are switched among four rotational patterns in a nonplanar chiral aromatic molecule (P)-2,2’- biphenol and perform the sequential switching among four rotational patterns which are performed by the overlapped pump-dump laser pulses. Coherent π-electron dynamics are generated by applying the linearly polarized UV pulse laser to create a pair of coherent quasidegenerated excited states. We also plot the time-dependent π-electron ring current, and discussed ring current transfer between two aromatic rings.

  3. Time-resolved UV spectroscopy on ammonia excited by a pulsed CO2 laser

    International Nuclear Information System (INIS)

    Holbach, H.

    1980-07-01

    This work investigates the excitation of ammonia by a pulsed CO 2 laser, in particular the processes associated with collisions with argon. It was prompted by two previous observations: the previously reported infrared multiphoton dissociation of NH 3 under nearly collisionless conditions, and the ill understood excitation mechanism of apparently nonresonant low vibrational levels in the presence of Ar. Based on recent spectroscopic data, all vibrational-rotational levels were determined which are simultaneously excited by different CO 2 laser lines. Transitions between the 1 + and 2 - vibrational levels were also taken into account. The linewidth in these calculations was dominated by power broadening, which generates a half width at half maximum of 0.36 cm -1 at the typical power density of 10 MW/cm 2 . In order to reproduce published experimental absorption data, it proved necessary to take account all transitions within a distance of 20 cm -1 from the laser line. This fact implies in most cases the simultaneous population of a large number of vibrational-rotational levels. The population of levels by absorption or by subsequent collisional processes was probed by time-resolved absorption measurement of vibrational bands and their rotational envelope in the near UV. Time resolution (5...10) was sufficient to observe rotational relaxation within individual vibrational levels. Characteristic differences were found for the various excitation lines. (orig.) [de

  4. Effect of UV-irradiation on sol-gel optical films

    International Nuclear Information System (INIS)

    Yang Fan; Shen Jun; Zhou Bin; Wu Guangming; Luo Aiyun; Sun Qi

    2005-01-01

    Sol-gel optical films were deposited on K9 glass and silicon wafer substrates by spin-coating method and a high-pressure mercury lamp was used to perform ultraviolet treating to solidify these films and improve their performance. SEM, AFM, IR and ellipsometer were used to characterize the structure and optical properties of the films. Mechanical property of films was measured by pencil hardness-testing device. Laser damage threshold of films was measured by a Q-switched Nd:YAG high power laser with the wave length of 1064 nm and the pulse width of 15 ns. The results show that UV-irradiation can improve the mechanical property and increase the refractive index of the films. Besides, the nodules on the surface of the films can be changed into pits by UV-irradiation process, so the laser damage threshold of sol-gel thin films will be increased. After UV-irradiation the laser damage threshold of single-layer ZrO 2 film reached 50.6 J/cm 2 (1064 nm, 1 ns). It is found that UV-irradiation is an effective method to avoid the infiltrating between the layers, and the degree of homogeneity of the multilayer films can be improved by this way. (authors)

  5. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  6. Ultraviolet laser technology and applications

    CERN Document Server

    Elliott, David L

    1995-01-01

    Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields.The text enables pr

  7. Improvement in the laser system for the A0 TTF photoinjector

    International Nuclear Information System (INIS)

    Yang, Xi

    2003-01-01

    The production of high charge and high brightness electron beams places increasingly challenging demands on the drive laser used at the A0 photoinjector in the Fermilab. The IR and UV laser pulse lengths need to be optimized for such purpose. We have experimentally investigated two different ways to change the UV laser pulse length on the cathode; either by changing the bandwidth of the oscillator or by changing the distance between two compression gratings, the UV laser pulse length can be varied in the range of 3ps to 30ps. Also the strong correlation between the UV laser energy and the IR laser pulse length has been studied, and the result is applied to achieve the UV laser energy of 18 (micro)J/pulse

  8. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    International Nuclear Information System (INIS)

    Kehagias, N; Reboud, V; Chansin, G; Zelsmann, M; Jeppesen, C; Schuster, C; Kubenz, M; Reuther, F; Gruetzner, G; Torres, C M Sotomayor

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional patterning. Three-dimensional woodpile-like structures were successfully fabricated with this new technique

  9. TE modes of UV-laser generated waveguides in a planar polymer chip of parabolic refractive index profile

    Science.gov (United States)

    Shams El-Din, M. A.

    2018-04-01

    The UV-laser lithographic method is used for the preparation of Polymeric integrated-optical waveguides in a planar polymer chip. The waveguide samples are irradiated by an excimer laser of wavelength 248 nm with different doses and with the same fluencies. The refractive index depth profile for the waveguides, in the first zone is found to have a parabolic shape and Gaussian shape in the second one that can be determined by Mach-Zehnder interferometer. Both the mode field distribution and the effective mode indices for the first zone only are determined by making use of the theoretical mode and the experimental data. It is found that the model field distribution is strongly dependent on the refractive indices for each zone.

  10. Nasal mask ventilation is better than face mask ventilation in edentulous patients.

    Science.gov (United States)

    Kapoor, Mukul Chandra; Rana, Sandeep; Singh, Arvind Kumar; Vishal, Vindhya; Sikdar, Indranil

    2016-01-01

    Face mask ventilation of the edentulous patient is often difficult as ineffective seating of the standard mask to the face prevents attainment of an adequate air seal. The efficacy of nasal ventilation in edentulous patients has been cited in case reports but has never been investigated. Consecutive edentulous adult patients scheduled for surgery under general anesthesia with endotracheal intubation, during a 17-month period, were prospectively evaluated. After induction of anesthesia and administration of neuromuscular blocker, lungs were ventilated with a standard anatomical face mask of appropriate size, using a volume controlled anesthesia ventilator with tidal volume set at 10 ml/kg. In case of inadequate ventilation, the mask position was adjusted to achieve best-fit. Inspired and expired tidal volumes were measured. Thereafter, the face mask was replaced by a nasal mask and after achieving best-fit, the inspired and expired tidal volumes were recorded. The difference in expired tidal volumes and airway pressures at best-fit with the use of the two masks and number of patients with inadequate ventilation with use of the masks were statistically analyzed. A total of 79 edentulous patients were recruited for the study. The difference in expiratory tidal volumes with the use of the two masks at best-fit was statistically significant (P = 0.0017). Despite the best-fit mask placement, adequacy of ventilation could not be achieved in 24.1% patients during face mask ventilation, and 12.7% patients during nasal mask ventilation and the difference was statistically significant. Nasal mask ventilation is more efficient than standard face mask ventilation in edentulous patients.

  11. Low-defect reflective mask blanks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Ray-Chaudhuri, A; Walton, C.

    1999-01-01

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA road map well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm ampersand sup2; at sign 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm ampersand sup2; for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm ampersand sup2; in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10 -2 /cm ampersand sup2; level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling

  12. Guiding flying-spot laser transepithelial phototherapeutic keratectomy with optical coherence tomography.

    Science.gov (United States)

    Li, Yan; Yokogawa, Hideaki; Tang, Maolong; Chamberlain, Winston; Zhang, Xinbo; Huang, David

    2017-04-01

    To analyze transepithelial phototherapeutic keratectomy (PTK) results using optical coherence tomography (OCT) and develop a model to guide the laser dioptric and depth settings. Casey Eye Institute, Portland, Oregon, USA. Prospective nonrandomized case series. Patients with superficial corneal opacities and irregularities had transepithelial PTK with a flying-spot excimer laser by combining wide-zone myopic and hyperopic astigmatic ablations. Optical coherence tomography was used to calculate corneal epithelial lenticular masking effects, guide refractive laser settings, and measure opacity removal. The laser ablation efficiency and the refractive outcome were investigated using multivariate linear regression models. Twenty-six eyes of 20 patients received PTK to remove opacities and irregular astigmatism due to scar, dystrophy, radial keratotomy, or previous corneal surgeries. The uncorrected distance visual acuity and corrected distance visual acuity were significantly improved (P laser ablation depths were 31.3% (myopic ablation) and 63.0% (hyperopic ablation) deeper than the manufacturer's nomogram. The spherical equivalent of the corneal epithelial lenticular masking effect was 0.73 diopter ± 0.61 (SD). The refractive outcome highly correlated to the laser settings and epithelial lenticular masking effect (Pearson R = 0.96, P < .01). The ablation rate of granular dystrophy opacities appeared to be slower. Smoothing ablation under masking fluid was needed to prevent focal steep islands in these cases. The OCT-measured ablation depth efficiency could guide opacity removal. The corneal epithelial lenticular masking effect could refine the spherical refractive nomogram to achieve a better refractive outcome after transepithelial ablation. Copyright © 2017 ASCRS and ESCRS. Published by Elsevier Inc. All rights reserved.

  13. Rapid, controllable, one-pot and room-temperature aqueous synthesis of ZnO:Cu nanoparticles by pulsed UV laser and its application for photocatalytic degradation of methyl orange.

    Science.gov (United States)

    Arabi, Mozhgan; Baizaee, Seyyed Mahdy; Bahador, Alireza; Otaqsara, Seyed Mohammad Taheri

    2018-05-01

    Zinc oxide (ZnO) and ZnO:Cu nanoparticles (NPs) were synthesized using a rapid, controllable, one-pot and room-temperature pulsed UV-laser assisted method. UV-laser irradiation was used as an effective energy source in order to gain better control over the NPs size and morphology in aqueous media. Parameters effective in laser assisted synthesis of NPs such as irradiation time and laser shot repetition rate were optimized. Photoluminescence (PL) spectra of ZnO NPs showed a broad emission with two trap state peaks located at 442 and 485 nm related to electronic transition from zinc interstitial level (I Zn ) to zinc vacancy level (V Zn ) and electronic transition from conduction band to the oxygen vacancy level (V O ), respectively. For ZnO:Cu NPs, trap state emissions disappeared completely and a copper (Cu)-related emission appeared. PL intensity of Cu-related emission increased with the increase in concentration of Cu 2+ , so that for molar ratio of Cu:Zn 2%, optimal value of PL intensity was obtained. The photocatalytic activity of Cu-doped ZnO revealed 50 and 100% increasement than that of undoped NPs under UV and visible irradiation, respectively. The enhanced photocatalytic activity could be attributed to smaller crystal size, as well as creation of impurity acceptor levels (T 2 ) inside the ZnO energy band gap. Copyright © 2017 John Wiley & Sons, Ltd.

  14. UV laser long-path absorption spectroscopy

    Science.gov (United States)

    Dorn, Hans-Peter; Brauers, Theo; Neuroth, Rudolf

    1994-01-01

    Long path Differential Optical Absorption Spectroscopy (DOAS) using a picosecond UV laser as a light source was developed in our institute. Tropospheric OH radicals are measured by their rotational absorption lines around 308 nm. The spectra are obtained using a high resolution spectrograph. The detection system has been improved over the formerly used optomechanical scanning device by application of a photodiode array which increased the observed spectral range by a factor of 6 and which utilizes the light much more effectively leading to a considerable reduction of the measurement time. This technique provides direct measurements of OH because the signal is given by the product of the absorption coefficient and the OH concentration along the light path according to Lambert-Beers law. No calibration is needed. Since the integrated absorption coefficient is well known the accuracy of the measurement essentially depends on the extent to which the OH absorption pattern can be detected in the spectra. No interference by self generated OH radicals in the detection lightpath has been observed. The large bandwidth (greater than 0.15 nm) and the high spectral resolution (1.5 pm) allows absolute determination of interferences by other trace gas absorptions. The measurement error is directly accessible from the absorption-signal to baseline-noise ratio in the spectra. The applicability of the method strongly depends on visibility. Elevated concentrations of aerosols lead to considerable attenuation of the laser light which reduces the S/N-ratio. In the moderately polluted air of Julich, where we performed a number of OH measurement spectra. In addition absorption features of unidentified species were frequently detected. A quantitative deconvolution even of the known species is not easy to achieve and can leave residual structures in the spectra. Thus interferences usually increase the noise and deteriorate the OH detection sensitivity. Using diode arrays for sensitive

  15. Binaural masking level differences in nonsimultanuous masking

    NARCIS (Netherlands)

    Kohlrausch, A.G.; Fassel, R.; Gilkey, R.H.; Anderson, T.R.

    1997-01-01

    This chapter investigates the extent to which binaural unmasking occurs with nonsimultaneous presentation of masker and signal, particularly in forward masking. The majority of previous studies that addressed this question found that there is a substantial binaural masking level difference (BMLD) in

  16. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  17. UV-laser-based longitudinal illuminated diffuser (LID) incorporating diffractive and Lambertian reflectance for the disinfection of beverages

    Science.gov (United States)

    Lizotte, Todd

    2010-08-01

    A novel laser beam shaping system was designed to demonstrate the potential of using high power UV laser sources for large scale disinfection of liquids used in the production of food products, such as juices, beer, milk and other beverage types. The design incorporates a patented assembly of optical components including a diffractive beam splitting/shaping element and a faceted pyramidal or conically shaped Lambertian diffuser made from a compression molded PTFE compounds. When properly sintered to an appropriate density, as an example between 1.10 and 1.40 grams per cubic centimeter, the compressed PTFE compounds show a ~99% reflectance at wavelengths ranging from 300 nm to 1500 nm, and a ~98.5% refection of wavelengths from 250 nm to 2000 nm [1]. The unique diffuser configuration also benefits from the fact that the PTFE compounds do not degrade when exposed to ultraviolet radiation as do barium sulfate materials and silver or aluminized mirror coatings [2]. These components are contained within a hermetically sealed quartz tube. Once assembled a laser beam is directed through one end of the tube. This window takes the form of a computer generated diffractive splitter or other diffractive shaper element to split the laser beam into a series of spot beamlets, circular rings or other geometric shapes. As each of the split beamlets or rings cascade downward, they illuminate various points along the tapered PTFE cone or faceted pyramidal form. As they strike the surface they each diffuse in a Lambertian reflectance pattern creating a pseudo-uniform circumferential illuminator along the length of the quartz tube enclosing the assembly. The compact tubular structure termed Longitudinal Illuminated Diffuser (LID) provides a unique UV disinfection source that can be placed within a centrifugal reactor or a pipe based reactor chamber. This paper will review the overall design principle, key component design parameters, preliminary analytic and bench operational testing

  18. Pattern Laser Annealing by a Pulsed Laser

    Science.gov (United States)

    Komiya, Yoshio; Hoh, Koichiro; Murakami, Koichi; Takahashi, Tetsuo; Tarui, Yasuo

    1981-10-01

    Preliminary experiments with contact-type pattern laser annealing were made for local polycrystallization of a-Si, local evaporation of a-Si and local formation of Ni-Si alloy. These experiments showed that the mask patterns can be replicated as annealed regions with a resolution of a few microns on substrates. To overcome shortcomings due to the contact type pattern annealing, a projection type reduction pattern laser annealing system is proposed for resistless low temperature pattern forming processes.

  19. Excimer laser beam profile recording based on electrochemical etched polycarbonate

    International Nuclear Information System (INIS)

    Parvin, P.; Jaleh, B.; Zangeneh, H.R.; Zamanipour, Z.; Davoud-Abadi, Gh.R.

    2008-01-01

    There is no polymeric detector used to register the beam profile of UV lasers. Here, a method is proposed for the measurement of intensive UV beam pattern of the excimer lasers based on the photoablated polycarbonate detector after coherent UV exposure and the subsequent electrochemical etching. UV laser induced defects in the form of self-microstructuring on polycarbonate are developed to replicate the spatial intensity distribution as a beam profiler

  20. Excimer laser beam profile recording based on electrochemical etched polycarbonate

    Energy Technology Data Exchange (ETDEWEB)

    Parvin, P. [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Hafez Ave, Tehran (Iran, Islamic Republic of); Laser Research Center, AEOI, P.O. Box 1165-8486, Tehran (Iran, Islamic Republic of)], E-mail: parvin@aut.ac.ir; Jaleh, B. [Physics Department, Bu-Ali Sina University, Postal Code 65174, Hamedan (Iran, Islamic Republic of); Zangeneh, H.R. [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Hafez Ave, Tehran (Iran, Islamic Republic of); Zamanipour, Z. [Laser Research Center, AEOI, P.O. Box 1165-8486, Tehran (Iran, Islamic Republic of); Davoud-Abadi, Gh.R. [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Hafez Ave, Tehran (Iran, Islamic Republic of)

    2008-08-15

    There is no polymeric detector used to register the beam profile of UV lasers. Here, a method is proposed for the measurement of intensive UV beam pattern of the excimer lasers based on the photoablated polycarbonate detector after coherent UV exposure and the subsequent electrochemical etching. UV laser induced defects in the form of self-microstructuring on polycarbonate are developed to replicate the spatial intensity distribution as a beam profiler.

  1. Omega: A 24-beam UV irradiation facility

    International Nuclear Information System (INIS)

    Richardson, M.C.; Beich, W.; Delettrez, J.

    1985-01-01

    The authors report on the characterization and performance of the 24-beam Omega laser facility under full third harmonic (351-nm) upconversion. This system provides for the first time a multibeam laser facility for the illumination of spherical targets with UV laser light in symmetric irradiation conditions with energies in the kilojoule range. This facility is capable of providing sufficient irradiation uniformity to test concepts of direct drive laser fusion with UV-driven ablation targets. The results of initial studies of ablatively driven DT-fueled glass microballoon targets will be described. The 24-beam Omega Nd:phosphate glass facility is capable of providing at 1054 nm output powers in excess of 10 TW in short ( 10 4 full system shots to date) irradiation facility with beam synchronism of approx. =3 psec, beam placement accuracy on target of 10 μm, and interbeam energy variance of approx. =2%. From measured target plane intensity distributions, overall illumination uniformity with tangentially focused beams is estimated to be approx. =5%. In 1984, a symmetric set of six beams was upconverted to 351-nm radiation using the polarization-mismatch scheme developed by Craxton. Monolithic cells of 20-cm clear aperture containing both frequency and doubler and tripler type II KDP crystals in index-matching propylene carbonate liquid were incorporated to output of six of the Omega beams with a full set of UV beam diagnostics

  2. Polarisation control of DFB fibre lasers

    DEFF Research Database (Denmark)

    Varming, Poul; Philipsen, Jacob Lundgreen; Berendt, Martin Ole

    1998-01-01

    The polarisation properties of a distributed feedback (DFB) fibre laser are investigated. It is shown experimentally that the birefringence of the UV induced phase-shift is the dominating effect controlling the polarisation properties of the laser......The polarisation properties of a distributed feedback (DFB) fibre laser are investigated. It is shown experimentally that the birefringence of the UV induced phase-shift is the dominating effect controlling the polarisation properties of the laser...

  3. Influence of solvents on UV degradation of polysilanes films

    International Nuclear Information System (INIS)

    Tkacova, M.; Schauer, F.

    2014-01-01

    In the paper we deal with the UV degradation process in polymers in general and silicon based polymers in particular, using the well-known prototypical polymer poly[methylphenylsilylene] (PMPSi). Attention is focused on the influence of solvents used for films preparation an don the UV degradation process in these films examined by Photoluminescence (PL) spectroscopy and Electrochemical Impedance Spectroscopy (EIS). The goal of the study is oriented on the writing of information into thin polymer films and production of nano masks for semiconductor industry. PMPSi is a prototypical silicon-based polymer from the polysilanes (PS) group that attracted attention because of their nonlinear optical and photoelectrical properties (authors)

  4. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  5. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  6. Matrix Optical Absorption in UV-MALDI MS.

    Science.gov (United States)

    Robinson, Kenneth N; Steven, Rory T; Bunch, Josephine

    2018-03-01

    In ultraviolet matrix-assisted laser desorption/ionization mass spectrometry (UV-MALDI MS) matrix compound optical absorption governs the uptake of laser energy, which in turn has a strong influence on experimental results. Despite this, quantitative absorption measurements are lacking for most matrix compounds. Furthermore, despite the use of UV-MALDI MS to detect a vast range of compounds, investigations into the effects of laser energy have been primarily restricted to single classes of analytes. We report the absolute solid state absorption spectra of the matrix compounds α-cyano-4-hydroxycinnamic acid (CHCA), para-nitroaniline (PNA), 2-mercaptobenzothiazole (MBT), 2,5-dihydroxybenzoic acid (2,5-DHB), and 2,4,6-trihydroxyacetophenone (THAP). The desorption/ionization characteristics of these matrix compounds with respect to laser fluence was investigated using mixed systems of matrix with either angiotensin II, PC(34:1) lipid standard, or haloperidol, acting as representatives for typical classes of analyte encountered in UV-MALDI MS. The first absolute solid phase spectra for PNA, MBT, and THAP are reported; additionally, inconsistencies between previously published spectra for CHCA are resolved. In light of these findings, suggestions are made for experimental optimization with regards to matrix and laser wavelength selection. The relationship between matrix optical cross-section and wavelength-dependant threshold fluence, fluence of maximum ion yield, and R, a new descriptor for the change in ion intensity with fluence, are described. A matrix cross-section of 1.3 × 10 -17 cm -2 was identified as a potential minimum for desorption/ionization of analytes. Graphical Abstract ᅟ.

  7. On red-shift of UV photoluminescence with decreasing size of silicon nanoparticles embedded in SiO2 matrix grown by pulsed laser deposition

    International Nuclear Information System (INIS)

    Chaturvedi, Amita; Joshi, M.P.; Rani, Ekta; Ingale, Alka; Srivastava, A.K.; Kukreja, L.M.

    2014-01-01

    Ensembles of silicon nanoparticles (Si-nps) embedded in SiO 2 matrix were grown by alternate ablation of Si and SiO 2 targets using KrF excimer laser based pulsed laser deposition (PLD). The sizes of Si-nps (mean size ranging from 1–5 nm) were controlled by varying the ablation time of silicon target. Transmission electron microscopy (TEM) along with selected area electron diffraction (SAED) and Raman spectroscopy were used to confirm the growth of silicon nanoparticles, its size variation with growth time and the crystalline quality of the grown nanoparticles. TEM analysis showed that mean size and size distribution of Si-nps increased with increase in the ablation time of Si target. Intense peaks ∼521 cm −1 in Raman analysis showed reasonably good crystalline quality of grown Si-nps. We observed asymmetric broadening of phonon line shapes which also redshift with decreasing size of Si-nps. Photoluminescence (PL) from these samples, obtained at room temperature, was broad band and consisted of three bands in UV and visible range. The intensity of PL band in UV spectral range (peak ∼3.2 eV) was strong compared to visible range bands (peaks ∼2.95 eV and ∼2.55 eV). We observed a small red-shift (∼0.07 eV) of peak position of UV range PL with the decrease in the mean sizes of Si-nps, while there was no appreciable size dependent shift of PL peak positions for other bands in the visible range. The width of UV PL band was also found to increase with decrease of Si-nps mean sizes. Based on the above observations of size dependent redshift of UV range PL band together with the PL lifetimes and PL excitation spectroscopy, the origin of UV PL band is attributed to the direct band transition at the Γ point of Si band structure. Visible range bands were ascribed as defect related transitions. The weak intensities of PL bands ∼2.95 eV and ∼2.55 eV suggested that Si nanoparticles grown by PLD were efficiently capped or passivated by SiO 2 with low density of

  8. Competing for Consciousness: Prolonged Mask Exposure Reduces Object Substitution Masking

    Science.gov (United States)

    Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

    2011-01-01

    In object substitution masking (OSM) a sparse, temporally trailing 4-dot mask impairs target identification, even though it has different contours from, and does not spatially overlap with the target. Here, we demonstrate a previously unknown characteristic of OSM: Observers show reduced masking at prolonged (e.g., 640 ms) relative to intermediate…

  9. Masking and Partial Masking in Listeners with a High-Frequency Hearing Loss

    NARCIS (Netherlands)

    Smits, J.T.S.; Duifhuis, H.

    1982-01-01

    3 listeners with sensorineural hearing loss ranging from moderate to moderate-severe starting at frequencies higher than 1 kHz participated in two masking experiments and a partial masking experiment. In the first masking experiment, fM = 1 kHz and LM = 50 dB SPL, higher than normal masked

  10. Utilization of the UV laser with picosecond pulses for the formation of surface microstructures on elastomeric plastics

    Science.gov (United States)

    Antoszewski, B.; Tofil, S.; Scendo, M.; Tarelnik, W.

    2017-08-01

    Elastomeric plastics belong to a wide range of polymeric materials with special properties. They are used as construction material for seals and other components in many branches of industry and, in particular, in the biomedical industry, mechatronics, electronics and chemical equipment. The micromachining of surfaces of these materials can be used to build micro-flow, insulating, dispensing systems and chemical and biological reactors. The paper presents results of research on the effects of micro-machining of selected elastomeric plastics using a UV laser emitting picosecond pulses. The authors see the prospective application of the developed technology in the sealing technique in particular to shaping the sealing pieces co-operating with the surface of the element. The result of the study is meant to show parameters of the UV laser’s performance when producing typical components such as grooves, recesses for optimum ablation in terms of quality and productivity.

  11. Optimal initiation of electronic excited state mediated intramolecular H-transfer in malonaldehyde by UV-laser pulses

    Science.gov (United States)

    Nandipati, K. R.; Singh, H.; Nagaprasad Reddy, S.; Kumar, K. A.; Mahapatra, S.

    2014-12-01

    Optimally controlled initiation of intramolecular H-transfer in malonaldehyde is accomplished by designing a sequence of ultrashort (~80 fs) down-chirped pump-dump ultra violet (UV)-laser pulses through an optically bright electronic excited [ S 2 ( π π ∗)] state as a mediator. The sequence of such laser pulses is theoretically synthesized within the framework of optimal control theory (OCT) and employing the well-known pump-dump scheme of Tannor and Rice [D.J. Tannor, S.A. Rice, J. Chem. Phys. 83, 5013 (1985)]. In the OCT, the control task is framed as the maximization of cost functional defined in terms of an objective function along with the constraints on the field intensity and system dynamics. The latter is monitored by solving the time-dependent Schrödinger equation. The initial guess, laser driven dynamics and the optimized pulse structure (i.e., the spectral content and temporal profile) followed by associated mechanism involved in fulfilling the control task are examined in detail and discussed. A comparative account of the dynamical outcomes within the Condon approximation for the transition dipole moment versus its more realistic value calculated ab initio is also presented.

  12. Broadening the applications of the atom probe technique by ultraviolet femtosecond laser

    Energy Technology Data Exchange (ETDEWEB)

    Hono, K., E-mail: kazuhiro.hono@nims.go.jp [National Institute for Materials Science, Tsukuba 305-0047 (Japan); Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-0047 (Japan); CREST, Japan Science and Technology Agency (Japan); Ohkubo, T. [National Institute for Materials Science, Tsukuba 305-0047 (Japan); CREST, Japan Science and Technology Agency (Japan); Chen, Y.M.; Kodzuka, M. [Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-0047 (Japan); Oh-ishi, K. [National Institute for Materials Science, Tsukuba 305-0047 (Japan); CREST, Japan Science and Technology Agency (Japan); Sepehri-Amin, H. [Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-0047 (Japan); Li, F. [National Institute for Materials Science, Tsukuba 305-0047 (Japan); CREST, Japan Science and Technology Agency (Japan); Kinno, T. [Corporate R and D Center, Toshiba Corporation, Saiwai-ku, Kawasaki 212-8582 (Japan); CREST, Japan Science and Technology Agency (Japan); Tomiya, S.; Kanitani, Y. [Advanced Materials Laboratory, Sony Corporation, Atsugi, Kanagawa 243-0021 (Japan)

    2011-05-15

    Laser assisted field evaporation using ultraviolet (UV) wavelength gives rise to better mass resolution and signal-to-noise ratio in atom probe mass spectra of metals, semiconductors and insulators compared to infrared and green lasers. Combined with the site specific specimen preparation techniques using the lift-out and annular Ga ion milling in a focused ion beam machine, a wide variety of materials including insulating oxides can be quantitatively analyzed by the three-dimensional atom probe using UV laser assisted field evaporation. After discussing laser irradiation conditions for optimized atom probe analyses, recent atom probe tomography results on oxides, semiconductor devices and grain boundaries of sintered magnets are presented. -- Research highlights: {yields} Application of ultraviolet (UV) femtosecond pulsed laser in a three dimensional atom probe (3DAP). {yields} Improved mass resolution and signal-to-noise ratio in atom probe mass spectra using UV laser. {yields} UV laser facilitates 3DAP analysis of insulating oxides. {yields} Quantitative analysis of wide variety of materials including insulating oxides using UV femotosecond laser.

  13. On the origin of increased sensitivity and mass resolution using silicon masks in MALDI.

    Science.gov (United States)

    Diologent, Laurent; Franck, Julien; Wisztorski, Maxence; Treizebre, Anthony; Focsa, Cristian; Fournier, Isabelle; Ziskind, Michael

    2014-02-04

    Since its development, MALDI has proved its performance in the analysis of intact biomolecules up to high molecular weights, regardless of their polarity. Sensitivity of MALDI instruments is a key point for breaking the limits of observing biomolecules of lower abundances. Instrumentation is one way to improve sensitivity by increasing ion transmission and using more sensitive detection systems. On the other side, improving MALDI ion production yields would have important outcomes. MALDI ion production is still not well-controlled and, indeed, the amount of ions produced per laser shot with respect to the total volume of desorbed material is very low. This has particular implications for certain applications, such as MALDI MS imaging where laser beam focusing as fine as possible (5-10 μm) is searched in order to reach higher spatial resolution images. However, various studies point out an intrinsic decrease in signal intensity for strong focusing. We have therefore been interested in developing silicon mask systems to decrease an irradiated area by cutting rather than focusing the laser beam and to study the parameters affecting sensitivity using such systems. For this, we systematically examined variation with laser fluence of intensity and spectral resolution in MALDI of standard peptides when using silicon-etched masks of various aperture sizes. These studies demonstrate a simultaneous increase in spectral resolution and signal intensity. Origin of this effect is discussed in the frame of the two-step ionization model. Experimental data in the low fluence range are fitted with an increase of the primary ionization through matrix-silicon edge contact provided by the masks. On the other hand, behavior at higher fluence could be explained by an effect on the secondary ionization via changes in the plume dynamics.

  14. Ultraviolet versus infrared: Effects of ablation laser wavelength on the expansion of laser-induced plasma into one-atmosphere argon gas

    International Nuclear Information System (INIS)

    Ma Qianli; Motto-Ros, Vincent; Laye, Fabrice; Yu Jin; Lei Wenqi; Bai Xueshi; Zheng Lijuan; Zeng Heping

    2012-01-01

    Laser-induced plasma from an aluminum target in one-atmosphere argon background has been investigated with ablation using nanosecond ultraviolet (UV: 355 nm) or infrared (IR: 1064 nm) laser pulses. Time- and space-resolved emission spectroscopy was used as a diagnostics tool to have access to the plasma parameters during its propagation into the background, such as optical emission intensity, electron density, and temperature. The specific feature of nanosecond laser ablation is that the pulse duration is significantly longer than the initiation time of the plasma. Laser-supported absorption wave due to post-ablation absorption of the laser radiation by the vapor plume and the shocked background gas plays a dominant role in the propagation and subsequently the behavior of the plasma. We demonstrate that the difference in absorption rate between UV and IR radiations leads to different propagation behaviors of the plasma produced with these radiations. The consequence is that higher electron density and temperature are observed for UV ablation. While for IR ablation, the plasma is found with lower electron density and temperature in a larger and more homogenous axial profile. The difference is also that for UV ablation, the background gas is principally evacuated by the expansion of the vapor plume as predicted by the standard piston model. While for IR ablation, the background gas is effectively mixed to the ejected vapor at least hundreds of nanoseconds after the initiation of the plasma. Our observations suggest a description by laser-supported combustion wave for the propagation of the plasma produced by UV laser, while that by laser-supported detonation wave for the propagation of the plasma produced by IR laser. Finally, practical consequences of specific expansion behavior for UV or IR ablation are discussed in terms of analytical performance promised by corresponding plasmas for application with laser-induced breakdown spectroscopy.

  15. Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers.

    Science.gov (United States)

    Ye, Hui; Li, Yaguo; Zhang, Qinghua; Wang, Wei; Yuan, Zhigang; Wang, Jian; Xu, Qiao

    2016-04-10

    HF-based (hydrofluoric acid) chemical etching has been a widely accepted technique to improve the laser damage performance of fused silica optics and ensure high-power UV laser systems at designed fluence. Etching processes such as acid concentration, composition, material removal amount, and etching state (etching with additional acoustic power or not) may have a great impact on the laser-induced damage threshold (LIDT) of treated sample surfaces. In order to find out the effects of these factors, we utilized the Taguchi method to determine the etching conditions that are helpful in raising the LIDT. Our results show that the most influential factors are concentration of etchants and the material etched away from the viewpoint of damage performance of fused silica optics. In addition, the additional acoustic power (∼0.6  W·cm-2) may not benefit the etching rate and damage performance of fused silica. Moreover, the post-cleaning procedure of etched samples is also important in damage performances of fused silica optics. Different post-cleaning procedures were, thus, experiments on samples treated under the same etching conditions. It is found that the "spraying + rinsing + spraying" cleaning process is favorable to the removal of etching-induced deposits. Residuals on the etched surface are harmful to surface roughness and optical transmission as well as laser damage performance.

  16. Non-equilibrium modeling of UV laser induced plasma on a copper target in the presence of Cu{sup 2+}

    Energy Technology Data Exchange (ETDEWEB)

    Ait Oumeziane, Amina, E-mail: a.aitoumeziane@gmail.com; Liani, Bachir [Laboratoire de Physique Théorique, Abou Beker Blekaid University (Algeria); Parisse, Jean-Denis [IUSTI UMR CNRS 7343, Aix-Marseille University (France); French Air School, Salon de Provence (France)

    2016-03-15

    This work is a contribution to the understanding of UV laser ablation of a copper sample in the presence of Cu{sup 2+} species as well as electronic non-equilibrium in the laser induced plasma. This particular study extends a previous paper and develops a 1D hydrodynamic model to describe the behavior of the laser induced plume, including the thermal non-equilibrium between electrons and heavy particles. Incorporating the formation of doubly charged ions (Cu{sup 2+}) in such an approach has not been considered previously. We evaluate the effect of the presence of doubly ionized species on the characteristics of the plume, i.e., temperature, pressure, and expansion velocity, and on the material itself by evaluating the ablation depth and plasma shielding effects. This study evaluates the effects of the doubly charged species using a non-equilibrium hydrodynamic approach which comprises a contribution to the understanding of the governing processes of the interaction of ultraviolet nanosecond laser pulses with metals and the parameter optimization depending on the intended application.

  17. UV-tunable laser induced phototransformations of matrix isolated anethole.

    Science.gov (United States)

    Krupa, Justyna; Wierzejewska, Maria; Nunes, Cláudio M; Fausto, Rui

    2014-03-14

    A matrix isolation study of the infrared spectra and structure of anethole (1-methoxy-4-(1-propenyl)benzene) has been carried out, showing the presence of two E conformers (AE1, AE2) of the molecule in the as-deposited matrices. Irradiation using ultraviolet-tunable laser light at 308-307 nm induced conformationally selective phototransformations of these forms into two less stable Z conformers (AZ1, AZ2). The back reactions were also detected upon irradiation at 301 nm. On the whole, the obtained results allow for full assignment of the infrared spectra of all the four experimentally observed anethole isomers and showed that the narrowband UV-induced E-Z photoisomerization is an efficient and selective way to interconvert the two isomers of anethole into each other, with conformational discrimination. Photolysis of anethole was observed as well, with initial methoxyl O-C bond cleavage and formation of CH3 and p-propenylphenoxy (AR) radicals, followed by radical recombination to form 2-methyl-4-propenyl-2,4-cyclohexadienone, which subsequently undergoes ring-opening generating several conformers of long-chain conjugated ketenes. Interpretation of the experimental observations was supported by density functional theory (B3LYP and B2PLYD) calculations.

  18. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  19. Effects of hard mask etch on final topography of advanced phase shift masks

    Science.gov (United States)

    Hortenbach, Olga; Rolff, Haiko; Lajn, Alexander; Baessler, Martin

    2017-07-01

    Continuous shrinking of the semiconductor device dimensions demands steady improvements of the lithographic resolution on wafer level. These requirements challenge the photomask industry to further improve the mask quality in all relevant printing characteristics. In this paper topography of the Phase Shift Masks (PSM) was investigated. Effects of hard mask etch on phase shift uniformity and mask absorber profile were studied. Design of experiments method (DoE) was used for the process optimization, whereas gas composition, bias power of the hard mask main etch and bias power of the over-etch were varied. In addition, influence of the over-etch time was examined at the end of the experiment. Absorber depth uniformity, sidewall angle (SWA), reactive ion etch lag (RIE lag) and through pitch (TP) dependence were analyzed. Measurements were performed by means of Atomic-force microscopy (AFM) using critical dimension (CD) mode with a boot-shaped tip. Scanning electron microscope (SEM) cross-section images were prepared to verify the profile quality. Finally CD analysis was performed to confirm the optimal etch conditions. Significant dependence of the absorber SWA on hard mask (HM) etch conditions was observed revealing an improvement potential for the mask absorber profile. It was found that hard mask etch can leave a depth footprint in the absorber layer. Thus, the etch depth uniformity of hard mask etch is crucial for achieving a uniform phase shift over the active mask area. The optimized hard mask etch process results in significantly improved mask topography without deterioration of tight CD specifications.

  20. Masking Period Patterns & Forward Masking for Speech-Shaped Noise: Age-related effects

    Science.gov (United States)

    Grose, John H.; Menezes, Denise C.; Porter, Heather L.; Griz, Silvana

    2015-01-01

    Objective The purpose of this study was to assess age-related changes in temporal resolution in listeners with relatively normal audiograms. The hypothesis was that increased susceptibility to non-simultaneous masking contributes to the hearing difficulties experienced by older listeners in complex fluctuating backgrounds. Design Participants included younger (n = 11), middle-aged (n = 12), and older (n = 11) listeners with relatively normal audiograms. The first phase of the study measured masking period patterns for speech-shaped noise maskers and signals. From these data, temporal window shapes were derived. The second phase measured forward-masking functions, and assessed how well the temporal window fits accounted for these data. Results The masking period patterns demonstrated increased susceptibility to backward masking in the older listeners, compatible with a more symmetric temporal window in this group. The forward-masking functions exhibited an age-related decline in recovery to baseline thresholds, and there was also an increase in the variability of the temporal window fits to these data. Conclusions This study demonstrated an age-related increase in susceptibility to non-simultaneous masking, supporting the hypothesis that exacerbated non-simultaneous masking contributes to age-related difficulties understanding speech in fluctuating noise. Further support for this hypothesis comes from limited speech-in-noise data suggesting an association between susceptibility to forward masking and speech understanding in modulated noise. PMID:26230495

  1. Characterization of LIL laser UV focal spot

    International Nuclear Information System (INIS)

    Mangeant, M.; Dubois, J.L.; Behar, G.; Arroyo, P.; Durand, V.; Lahonde, C.

    2006-01-01

    One way to get the fusion of hydrogen in laboratory consists in heating and compressing a DT fuel capsule by using a laser. To reach this aim requires a new generation of high power laser facility. Cea (French board for atomic energy) is developing for this purpose a new 240 laser line facility, the LMJ facility. The LIL which is the prototype of four LMJ laser lines is operational now. In order to confirm the technical choices, a systematic characterization of LIL was carried out. A particular effort has been provided to measure the 3ω high energy focal spot (1.5 kJ/700 ps and 5 ns for one beam) and the synchronization of laser beams onto the target, which are key issues for the plasma production. An experimental device, SAT-3ω (a 3ω laser focal spot analysis) has been designed to perform these measures. That diagnostic which is located at the end of the laser lines delivered its first results during the 2004 quadruplet qualification campaigns. The near field imaging showed no diaphony and vignetting. Low power spots allowed us to control we had no ghost. The energy measurement quality showed the photometric transfer function was perfectly known. Our caustic image are given with an average dynamic range of 800, a spatial resolution of 10 μm and diameter accuracy about 1% for 50% and 3% for 90% of encircled energy. The high energy focal spot diameters are in agreement with low and very low energy diameters. The phase plate and 14 GHz effects are similar to what we had expected. For a laser shot completed with a continuous phase plate at 14 GHz, and for an energy level of 1.5 kJ per beam at 351 nm, the focal beam diameter at 3% of the peak level is (875 ± 45) μm

  2. UV-laser microdissection system - A novel approach for the preparation of high-resolution stable isotope records (δ13C/δ18O) from tree rings

    Science.gov (United States)

    Schollaen, Karina; Helle, Gerhard

    2013-04-01

    Intra-annual stable isotope (δ13C and δ18O) studies of tree rings at various incremental resolutions have been attempting to extract valuable seasonal climatic and environmental information or assessing plant ecophysiological processes. For preparing high-resolution isotope samples normally wood segments or cores are mechanically divided in radial direction or cut in tangential direction. After mechanical dissection, wood samples are ground to a fine powder and either cellulose is extracted or bulk wood samples are analyzed. Here, we present a novel approach for the preparation of high-resolution stable isotope records from tree rings using an UV-laser microdissection system. Firstly, tree-ring cellulose is directly extracted from wholewood cross-sections largely leaving the wood anatomical structure intact and saving time as compared to the classical procedure. Secondly, micro-samples from cellulose cross-sections are dissected with an UV-Laser dissection microscope. Tissues of interest from cellulose cross-sections are identified and marked precisely with a screen-pen and dissected via an UV-laser beam. Dissected cellulose segments were automatically collected in capsules and are prepared for stable isotope (δ13C and δ18O) analysis. The new techniques facilitate inter- and intra-annual isotope analysis on tree-ring and open various possibilities for comparisons with wood anatomy in plant eco-physiological studies. We describe the design and the handling of this novel methodology and discuss advantages and constraints given by the example of intra-annual oxygen isotope analysis on tropical trees.

  3. Laser-UV-microirradiation of Chinese hamster cells: the influence of the distribution of photolesions on unscheduled DNA synthesis

    International Nuclear Information System (INIS)

    Cremer, C.; Jabbur, G.

    1981-01-01

    Fibroblastoid Chinese hamster cells synchronized by mitotic selection were microirradiated in G1, using a low power laser-UV-microbeam (lambda = 257 nm). The incident energy was either concentrated on a small part of the nucleus (mode 1) or distributed over the whole nucleus (mode 11). Using the same incident UV energy, the local UV fluences were estimated to differ by two orders of magnitude. Following microirradiation the cells were incubated with [ 3 H]-thymidine for 2 h and thereafter processed for autoradiography. Silver grains were concentrated over the microirradiated part after mode 1 and distributed over the whole nucleus after mode 11 irradiation. To quantify the amount of unscheduled DNA synthesis, the number of grains per nucleus was determined. It increased with the total incident energy, but was not or only slightly affected by the mode of microirradiation, if appropriate autoradiographic conditions were used. The findings suggest that within the investigated range of energy densities (2.7-1000 J/m 2 ), the total amount of unscheduled DNA synthesis depends on the total number of pyrimidine dimers but not on their distribution in nuclear DNA. (author)

  4. Laser Dyes

    Indian Academy of Sciences (India)

    amplification or generation of coherent light waves in the UV,. VIS, and near IR region. .... ciency in most flashlamp pumped dye lasers. It is used as reference dye .... have led to superior laser dyes with increased photostabilities. For instance ...

  5. Effects of laser energy and wavelength on the analysis of LiFePO4 using laser assisted atom probe tomography

    International Nuclear Information System (INIS)

    Santhanagopalan, Dhamodaran; Schreiber, Daniel K.; Perea, Daniel E.; Martens, Richard L.; Janssen, Yuri; Khalifah, Peter; Meng, Ying Shirley

    2015-01-01

    The effects of laser wavelength (355 nm and 532 nm) and laser pulse energy on the quantitative analysis of LiFePO 4 by atom probe tomography are considered. A systematic investigation of ultraviolet (UV, 355 nm) and green (532 nm) laser assisted field evaporation has revealed distinctly different behaviors. With the use of a UV laser, the major issue was identified as the preferential loss of oxygen (up to 10 at%) while other elements (Li, Fe and P) were observed to be close to nominal ratios. Lowering the laser energy per pulse to 1 pJ/pulse from 50 pJ/pulse increased the observed oxygen concentration to nearer its correct stoichiometry, which was also well correlated with systematically higher concentrations of 16 O 2 + ions. Green laser assisted field evaporation led to the selective loss of Li (∼33% deficiency) and a relatively minor O deficiency. The loss of Li is likely a result of selective dc evaporation of Li between or after laser pulses. Comparison of the UV and green laser data suggests that the green wavelength energy was absorbed less efficiently than the UV wavelength because of differences in absorption at 355 and 532 nm for LiFePO 4 . Plotting of multihit events on Saxey plots also revealed a strong neutral O 2 loss from molecular dissociation, but quantification of this loss was insufficient to account for the observed oxygen deficiency. - Highlights: • Laser wavelength and pulse energy affect accuracy of APT analysis of LiFePO 4 . • Oxygen deficiency observed for UV laser; stronger at higher laser energies. • Selective loss of Li with green laser due to dc evaporation. • Saxey plots reveal prevalent formation of O 2 neutrals. • Quantification of molecular dissociations cannot account for O deficiency

  6. Dependence of adhesion strength between GaN LEDs and sapphire substrate on power density of UV laser irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Park, Junsu [Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of); Sin, Young-Gwan [Department of Nano-Mechatronics, Korea University of Science and Technology (UST), 217 Gajeong-Ro, Yuseong-Gu, Daejeon 34113 (Korea, Republic of); Kim, Jae-Hyun [Department of Nano-Mechanics, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of); Kim, Jaegu, E-mail: gugu99@kimm.re.kr [Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of)

    2016-10-30

    Highlights: • Fundamental relationship between laser irradiation and adhesion strength, between gallium-nitride light emitted diode and sapphire substrate, is proposed during selective laser lift-off. • Two competing mechanisms affect adhesion at the irradiated interface between the GaN LED and sapphire substrate. • Ga precipitation caused by thermal decomposition and roughened interface caused by thermal damage lead to the considerable difference of adhesion strength at the interface. - Abstract: Selective laser lift-off (SLLO) is an innovative technology used to manufacture and repair micro-light-emitting diode (LED) displays. In SLLO, laser is irradiated to selectively separate micro-LED devices from a transparent sapphire substrate. The light source used is an ultraviolet (UV) laser with a wavelength of 266 nm, pulse duration of 20 ns, and repetition rate of 30 kHz. Controlled adhesion between a LED and the substrate is key for a SLLO process with high yield and reliability. This study examined the fundamental relationship between adhesion and laser irradiation. Two competing mechanisms affect adhesion at the irradiated interface between the GaN LED and sapphire substrate: Ga precipitation caused by the thermal decomposition of GaN and roughened interface caused by thermal damage on the sapphire. The competition between these two mechanisms leads to a non-trivial SLLO condition that needs optimization. This study helps understand the SLLO process, and accelerate the development of a process for manufacturing micro-LED displays via SLLO for future applications.

  7. One-shot deep-UV pulsed-laser-induced photomodification of hollow metal nanoparticles for high-density data storage on flexible substrates.

    Science.gov (United States)

    Wan, Dehui; Chen, Hsuen-Li; Tseng, Shao-Chin; Wang, Lon A; Chen, Yung-Pin

    2010-01-26

    In this paper, we report a new optical data storage method: photomodification of hollow gold nanoparticle (HGN) monolayers induced by one-shot deep-ultraviolet (DUV) KrF laser recording. As far as we are aware, this study is the first to apply HGNs in optical data storage and also the first to use a recording light source for the metal nanoparticles (NPs) that is not a surface plasmon resonance (SPR) wavelength. The short wavelength of the recording DUV laser improved the optical resolution dramatically. We prepared HGNs exhibiting two absorbance regions: an SPR peak in the near-infrared (NIR) region and an intrinsic material extinction in the DUV region. A single pulse from a KrF laser heated the HGNs and transformed them from hollow structures to smaller solid spheres. This change in morphology for the HGNs was accompanied by a significant blue shift of the SPR peak. Employing this approach, we demonstrated its patterning ability with a resolving power of a half-micrometer (using a phase mask) and developed a readout method (using a blue-ray laser microscope). Moreover, we prepared large-area, uniform patterns of monolayer HGNs on various substrates (glass slides, silicon wafers, flexible plates). If this spectral recording technique could be applied onto thin flexible tapes, the recorded data density would increase significantly relative to that of current rigid discs (e.g., compact discs).

  8. Laser wavelength dependent properties of YBa2Cu3O7-δ thin films deposited by laser ablation

    International Nuclear Information System (INIS)

    Koren, G.; Gupta, A.; Baseman, R.J.; Lutwyche, M.I.; Laibowitz, R.B.

    1989-01-01

    YBa 2 Cu 3 O 7-δ thin films were deposited onto (100) SrTiO 3 substrates using 1064, 532, 355, 248, and 193 nm laser ablation. Transport measurements show lower normal-state resistivities and higher critical currents in films deposited by the shorter wavelength lasers. The surface morphology of the films was rough with large particulates when the 1064 nm laser was used whereas much smoother surfaces with fewer and smaller particulates were obtained with the UV lasers. It is suggested that the better film quality obtained when the UV lasers are used is due to a small absorption depth of the UV photons in the ceramic target and to higher absorption by the ablated fragments. This leads to smaller ablated species and further fragmentation in the hotter plume and, therefore, to smoother and denser films

  9. Studies of high repetition rate laser-produced plasma soft-X-ray amplifiers

    International Nuclear Information System (INIS)

    Cassou, K.

    2006-12-01

    The progress made as well on the Ti:Sa laser system, as in the control and the knowledge of laser produced X-UV sources allowed the construction of a X-UV laser station dedicated to the applications. My thesis work falls under the development of this station and more particularly on the characterization of a X-UV laser plasma amplifier. The experimental study relates to the coupling improvement of the pump infra-red laser with plasma within the framework of the transient collisional X-UV laser generation. These X-UV lasers are generated in a plasma formed by the interaction of a solid target and a laser pulse of approximately 500 ps duration, followed by a second infra-red laser pulse known as of pump (about 5 ps) impinging on the target in grazing incidence. For the first time, a complete parametric study was undertaken on the influence of the grazing angle on the pumping of the amplifying medium. One of the results was to reach very high peak brightness about 10 28 ph/s/mm 2 /mrad 2 /(0.1%bandwidth), which compares well with the free-electron laser brightness. Moreover, we modified then used a new two-dimensional hydrodynamic code with adaptive mesh refinement in order to understand the influence of the space-time properties of the infra-red laser on the formation and the evolution of the amplifying plasma. Our modeling highlighted the interest to use a super Gaussian transverse profile for the line focus leading to an increase in a factor two of the gain region size and a reduction of the electron density gradient by three orders of magnitude. These improvements should strongly increase the energy contained in X-UV laser beam. We thus used X-UV laser to study the appearance of transient defects produced by a laser IR on a beam-splitter rear side. We also began research on the mechanisms of DNA damage induced by a very intense X-UV radiation. (author)

  10. Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

    International Nuclear Information System (INIS)

    Weber, Patrick; Guibert, Edouard; Mikhailov, Serguei; Bruegger, Juergen; Villanueva, Guillermo

    2009-01-01

    Ion beam LIGA allows the etching of 3D nano-structures by direct writing with a nano-sized beam. However, this is a relatively time consuming process. We propose here another approach for etching structures on large surfaces and faster, compared to the direct writing process. This approach consists of replicating 3D structured masks, by scanning an unfocused ion beam. A polymer substrate is placed behind the mask, as in UV photolithography. But the main advantage is that the 3D structure of the mask can be replicated into the polymer. For that purpose, the masks (developped at LMIS1, EPFL) are made of a silicon nitride membrane 100 nm thick, on which 3D gold structures up to 200 nm thick, are deposited. The 3D Au structures are made with the nanostencil method, based on successive gold deposition. The IMA institute, from HE-Arc, owns a High Voltage Engineering 1.7 MV Tandetron with both solid and gaseous negative ion sources, able to generate ions from almost every chemical element in a broad range of energies comprised between 400 keV and 6.8 MeV. The beam composition and energy are chosen in such a way, that ions lose a significant fraction of their energy when passing through the thickest regions of the mask. Ions passing through thinner regions of the mask loose a smaller fraction of their energy and etch the polymer with larger thicknesses, allowing a replication of the mask into the polymer. For our trials, we have used a carbon beam with an energy of 500 keV. The beam was focussed to a diameter of 5 mm with solid slits, in order to avoid border effects and thus ensure a homogeneous dose distribution on the beam diameter. The feasibility of this technique has been demonstrated, allowing industrial applications for micro-mould fabrication, micro-fluidics and micro-optics.

  11. Evaluation of the performance of small diode pumped UV solid state (DPSS) Nd:YAG lasers as new radiation sources for atmospheric pressure laser ionization mass spectrometry (APLI-MS).

    Science.gov (United States)

    Kersten, Hendrik; Lorenz, Matthias; Brockmann, Klaus J; Benter, Thorsten

    2011-06-01

    The performance of a KrF* bench top excimer laser and a compact diode pumped UV solid state (DPSS) Nd:YAG laser as photo-ionizing source in LC-APLI MS is compared. The commonly applied bench-top excimer laser, operating at 248 nm, provides power densities of the order of low MW/cm(2) on an illuminated area of 0.5 cm(2) (8 mJ/pulse, 5 ns pulse duration, beam waist area 0.5 cm(2), 3 MW/cm(2)). The DPSS laser, operating at 266 nm, provides higher power densities, however, on a two orders of magnitude smaller illuminated area (60 μJ/pulse, 1 ns pulse duration, beam waist area 2 × 10(-3) cm(2), 30 MW/cm(2)). In a common LC-APLI MS setup with direct infusion of a 10 nM pyrene solution, the DPSS laser yields a significantly smaller ion signal (0.9%) and signal to noise ratio (1.4%) compared with the excimer laser. With respect to the determined low detection limits (LODs) for PAHs of 0.1 fmol using an excimer laser, LODs in DPSS laser LC-APLI MS in the low pmol regime are expected. The advantages of the DPSS laser with respect to applicability (size, cost, simplicity) may render this light source the preferred one for APLI applications not focusing on ultimately high sensitivities. Furthermore, the impact of adjustable ion source parameters on the performance of both laser systems is discussed in terms of the spatial sensitivity distribution described by the distribution of ion acceptance (DIA) measurements. Perspectives concerning the impact on future APLI-MS applications are given.

  12. Masking Period Patterns and Forward Masking for Speech-Shaped Noise: Age-Related Effects.

    Science.gov (United States)

    Grose, John H; Menezes, Denise C; Porter, Heather L; Griz, Silvana

    2016-01-01

    The purpose of this study was to assess age-related changes in temporal resolution in listeners with relatively normal audiograms. The hypothesis was that increased susceptibility to nonsimultaneous masking contributes to the hearing difficulties experienced by older listeners in complex fluctuating backgrounds. Participants included younger (n = 11), middle-age (n = 12), and older (n = 11) listeners with relatively normal audiograms. The first phase of the study measured masking period patterns for speech-shaped noise maskers and signals. From these data, temporal window shapes were derived. The second phase measured forward-masking functions and assessed how well the temporal window fits accounted for these data. The masking period patterns demonstrated increased susceptibility to backward masking in the older listeners, compatible with a more symmetric temporal window in this group. The forward-masking functions exhibited an age-related decline in recovery to baseline thresholds, and there was also an increase in the variability of the temporal window fits to these data. This study demonstrated an age-related increase in susceptibility to nonsimultaneous masking, supporting the hypothesis that exacerbated nonsimultaneous masking contributes to age-related difficulties understanding speech in fluctuating noise. Further support for this hypothesis comes from limited speech-in-noise data, suggesting an association between susceptibility to forward masking and speech understanding in modulated noise.

  13. Mask alignment system for semiconductor processing

    Science.gov (United States)

    Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.; Grant, Christopher N.

    2017-02-14

    A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

  14. UV light blocks EGFR signalling in human cancer cell lines

    DEFF Research Database (Denmark)

    Olsen, BB; Neves-Petersen, M T; Klitgaard, S

    2007-01-01

    UV light excites aromatic residues, causing these to disrupt nearby disulphide bridges. The EGF receptor is rich in aromatic residues near the disulphide bridges. Herein we show that laser-pulsed UV illumination of two different skin-derived cancer cell lines i.e. Cal-39 and A431, which both...... antibodies. There was a threshold level, below which the receptor could not be blocked. In addition, illumination caused the cells to upregulate the cyclin-dependent kinase inhibitor p21WAF1, irrespective of the p53 status. Since the EGF receptor is often overexpressed in cancers and other proliferative skin...... disorders, it might be possible to significantly reduce the proliferative potential of these cells making them good targets for laser-pulsed UV light treatment....

  15. UV Lidar Receiver Analysis for Tropospheric Sensing of Ozone

    Science.gov (United States)

    Pliutau, Denis; DeYoung, Russell J.

    2013-01-01

    A simulation of a ground based Ultra-Violet Differential Absorption Lidar (UV-DIAL) receiver system was performed under realistic daytime conditions to understand how range and lidar performance can be improved for a given UV pulse laser energy. Calculations were also performed for an aerosol channel transmitting at 3 W. The lidar receiver simulation studies were optimized for the purpose of tropospheric ozone measurements. The transmitted lidar UV measurements were from 285 to 295 nm and the aerosol channel was 527-nm. The calculations are based on atmospheric transmission given by the HITRAN database and the Modern Era Retrospective Analysis for Research and Applications (MERRA) meteorological data. The aerosol attenuation is estimated using both the BACKSCAT 4.0 code as well as data collected during the CALIPSO mission. The lidar performance is estimated for both diffuseirradiance free cases corresponding to nighttime operation as well as the daytime diffuse scattered radiation component based on previously reported experimental data. This analysis presets calculations of the UV-DIAL receiver ozone and aerosol measurement range as a function of sky irradiance, filter bandwidth and laser transmitted UV and 527-nm energy

  16. 2012 Mask Industry Survey

    Science.gov (United States)

    Malloy, Matt; Litt, Lloyd C.

    2012-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year's survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.

  17. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime......The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either...... experiments under ideal conditions or as experiments under more realistic conditions useful for real-life applications such as hearing aids. In the experiments under ideal conditions, the previously defined ideal binary mask is evaluated using hearing impaired listeners, and a novel binary mask -- the target...... binary mask -- is introduced. The target binary mask shows the same substantial increase in intelligibility as the ideal binary mask and is proposed as a new reference for binary masking. In the category of real-life applications, two new methods are proposed: a method for estimation of the ideal binary...

  18. Traditional Chinese Masks Reveal Customs

    Institute of Scientific and Technical Information of China (English)

    1996-01-01

    CHINESE masks are undoubtedly an important component in the worldwide mask culture. Minority nationality masks are a major component of China’s mask culture. Traditional Chinese masks, or nuo, represent a cultural component which originated from religious rites in prehistoric times. Various types of nuo are highly valuable for studies of Chinese customs.

  19. Spectral narrowing of a 980 nm tapered diode laser bar

    DEFF Research Database (Denmark)

    Vijayakumar, Deepak; Jensen, Ole Bjarlin; Lucas Leclin, Gaëlle

    2011-01-01

    High power diode laser bars are interesting in many applications such as solid state laser pumping, material processing, laser trapping, laser cooling and second harmonic generation. Often, the free running laser bars emit a broad spectrum of the order of several nanometres which limit their scope...... been "smile corrected" using individual phase masks for each emitter. The external cavity consists of the laser bar, both fast and slow axis micro collimators, smile correcting phase mask, 6.5x beam expanding lens combination, a 1200 lines/mm reflecting grating with 85% efficiency in the first order......, a slow axis focusing cylindrical lens of 40 mm focal length and an output coupler which is 10% reflective. In the free running mode, the laser emission spectrum was 5.5 nm wide at an operating current of 30A. The output power was measured to be in excess of 12W. Under the external cavity operation...

  20. Partially Transparent Petaled Mask/Occulter for Visible-Range Spectrum

    Science.gov (United States)

    Shiri, Ron Shahram; Wasylkiwskyj, Wasyl

    2013-01-01

    The presence of the Poisson Spot, also known as the spot of Arago, has been known since the 18th century. This spot is the consequence of constructive interference of light diffracted by the edge of the obstacle where the central position can be determined by symmetry of the object. More recently, many NASA missions require the suppression of this spot in the visible range. For instance, the exoplanetary missions involving space telescopes require telescopes to image the planetary bodies orbiting central stars. For this purpose, the starlight needs to be suppressed by several orders of magnitude in order to image the reflected light from the orbiting planet. For the Earth-like planets, this suppression needs to be at least ten orders of magnitude. One of the common methods of suppression involves sharp binary petaled occulters envisioned to be placed many thousands of miles away from the telescope blocking the starlight. The suppression of the Poisson Spot by binary sharp petal tips can be problematic when the thickness of the tips becomes smaller than the wavelength of the incident beam. First they are difficult to manufacture and also it invalidates the laws of physical optics. The proposed partially transparent petaled masks/occulters compensate for this sharpness with transparency along the surface of the petals. Depending on the geometry of the problem, this transparency can be customized such that only a small region of the petal is transparent and the remaining of the surface is opaque. This feature allows easy fabrication of this type of occultation device either as a mask or occulter. A partially transparent petaled mask/ occulter has been designed for the visible spectrum range. The mask/occulter can suppress the intensity along the optical axis up to ten orders of magnitude. The design process can tailor the mask shape, number of petals, and transparency level to the near-field and farfield diffraction region. The mask/occulter can be used in space

  1. UV laser-induced histone-DNA crosslinking proceeds via the N-terminal tails

    International Nuclear Information System (INIS)

    Stefanovski, V.; Dimitrov, S.; Angelov, D.; Keskinova, E.; Pashev, I.

    1990-01-01

    The covalent crosslinking of histones to DNA by UV laser irradiation is accomplished solely via the N-terminal part of the molecule. Irradiated isolated calfthymus nuclei are treated with clostripain. The crosslinked protein-DNA complexes are isolated and the presence of each core histone analyzed by dot-immunoassay using antibodies, specific to the central globular domain of the respective histone. The reaction is negative for all core histones i.e. the globular domain is absent. It means that this domain has not been crosslinked to DNA and, once cleaved by clostripain, it has been stripped from DNA during the centrigugation in CsCl. This peculiar property of the crosslinked procedure makes it particularly useful in addressing some yet unanswered questions concerning histone-DNA interactions, such as the interaction of the N-terminal tails with linker DNA, the effect of the transient postsynthetic histone acetylation on its interaction with DNA, etc. These questions are now under study. 1 fig., 6 refs

  2. Robust source and mask optimization compensating for mask topography effects in computational lithography.

    Science.gov (United States)

    Li, Jia; Lam, Edmund Y

    2014-04-21

    Mask topography effects need to be taken into consideration for a more accurate solution of source mask optimization (SMO) in advanced optical lithography. However, rigorous 3D mask models generally involve intensive computation and conventional SMO fails to manipulate the mask-induced undesired phase errors that degrade the usable depth of focus (uDOF) and process yield. In this work, an optimization approach incorporating pupil wavefront aberrations into SMO procedure is developed as an alternative to maximize the uDOF. We first design the pupil wavefront function by adding primary and secondary spherical aberrations through the coefficients of the Zernike polynomials, and then apply the conjugate gradient method to achieve an optimal source-mask pair under the condition of aberrated pupil. We also use a statistical model to determine the Zernike coefficients for the phase control and adjustment. Rigorous simulations of thick masks show that this approach provides compensation for mask topography effects by improving the pattern fidelity and increasing uDOF.

  3. Coupled optical resonance laser locking.

    Science.gov (United States)

    Burd, S C; du Toit, P J W; Uys, H

    2014-10-20

    We have demonstrated simultaneous laser frequency stabilization of a UV and IR laser, to coupled transitions of ions in the same spectroscopic sample, by detecting only the absorption of the UV laser. Separate signals for locking the different lasers are obtained by modulating each laser at a different frequency and using lock-in detection of a single photodiode signal. Experimentally, we simultaneously lock a 369 nm and a 935 nm laser to the (2)S(1/2) → (2)(P(1/2) and (2)D(3/2) → (3)D([3/2]1/2) transitions, respectively, of Yb(+) ions generated in a hollow cathode discharge lamp. Stabilized lasers at these frequencies are required for cooling and trapping Yb(+) ions, used in quantum information and in high precision metrology experiments. This technique should be readily applicable to other ion and neutral atom systems requiring multiple stabilized lasers.

  4. Modulation cues influence binaural masking-level difference in masking-pattern experiments.

    Science.gov (United States)

    Nitschmann, Marc; Verhey, Jesko L

    2012-03-01

    Binaural masking patterns show a steep decrease in the binaural masking-level difference (BMLD) when masker and signal have no frequency component in common. Experimental threshold data are presented together with model simulations for a diotic masker centered at 250 or 500 Hz and a bandwidth of 10 or 100 Hz masking a sinusoid interaurally in phase (S(0)) or in antiphase (S(π)). Simulations with a binaural model, including a modulation filterbank for the monaural analysis, indicate that a large portion of the decrease in the BMLD in remote-masking conditions may be due to an additional modulation cue available for monaural detection. © 2012 Acoustical Society of America

  5. Potential for GPC-based laser direct writing

    DEFF Research Database (Denmark)

    Bañas, Andrew; Glückstad, Jesper

    2016-01-01

    lasers for such applications by using phase modulation as opposed to amplitude truncating masks. Here, we explore GPC’s potential for increasing the yield of micropscopic 3D printing also known as direct laser writing. Many light based additive manufacturing techniques, adopt a point scanning approach...

  6. UV-induced carbon monoxide emission from living vegetation

    DEFF Research Database (Denmark)

    Bruhn, Dan; Albert, Kristian Rost; Mikkelsen, Teis Nørgaard

    2013-01-01

    The global burden of carbon monoxide (CO) is rather uncertain. In this paper we address the potential for UV-induced CO emission by living terrestrial vegetation surfaces. Real-time measurements of CO concentrations were made with a cavity enhanced laser spectrometer connected in closed loop...... to either an ecosystem chamber or a plant-leaf scale chamber. Leaves of all examined plant species exhibited emission of CO in response to artificial UV-radiation as well as the UV-component of natural solar radiation. The UV-induced rate of CO emission exhibited a rather low dependence on temperature......, indicating an abiotic process. The emission of CO in response to the UV-component of natural solar radiation was also evident at the ecosystem scale....

  7. UV dissociation of vibrationally excited UF6

    International Nuclear Information System (INIS)

    Alexandre, M.; Clerc, M.; Gagnon, R.; Gilbert, M.; Isnard, P.; Nectoux, P.; Rigny, P.; Weulersse, J.M.

    1983-01-01

    Before application of laser photodissociation of UF 6 to the separation of uranium isotopes becomes practical, isotopic selectivity should be optimized. We present here results on the cross sections involved in the irradiation of UF 6 simultaneously with infrared and ultraviolet lasers, as a function of wavelengths, fluence and temperature (at 293 K and 105 K, in an adiabatic expansion). The experiment uses a Nd 3+ YAG pumped lithium niobate optical parametric oscillator as a tunable 16 μ light source. Energies of the order of 1 mJ can be obtained with linewidths smaller than 0.1 cm - . The UV source used is based on ND 3+ YAG pumped dye laser and various frequency mixing schemes. At low temperature the frequency variation of the absorbed infrared energy per molecule depends markedly on the IR fluence phisub(IR) with a maximum value varying as phisub(IR)sup(-1/2) and a frequency extension far beyond the low level absorption spectrum. The absorbed vibrational energy leads to a change in the UV cross section comparable with the effect of a rise in temperature. Using this a model is put forward to express the isotopic selectivity 235 U/ 238 U as a function of UV wavelength and IR irradiation conditions. Experimental results agree with this model, and yield to maximum selectivity close to two [fr

  8. Unmasking Zorro: functional importance of the facial mask in the Masked Shrike (Lanius nubicus)

    OpenAIRE

    Reuven Yosef; Piotr Zduniak; Piotr Tryjanowski

    2012-01-01

    The facial mask is a prominent feature in the animal kingdom. We hypothesized that the facial mask of shrikes allows them to hunt into the sun, which accords them detection and surprise-attack capabilities. We conducted a field experiment to determine whether the mask facilitated foraging while facing into the sun. Male shrikes with white-painted masks hunted facing away from the sun more than birds with black-painted masks, which are the natural color, and more than individuals in the contro...

  9. Nanoimprinted organic semiconductor laser pumped by a light-emitting diode.

    Science.gov (United States)

    Tsiminis, Georgios; Wang, Yue; Kanibolotsky, Alexander L; Inigo, Anto R; Skabara, Peter J; Samuel, Ifor D W; Turnbull, Graham A

    2013-05-28

    An organic semiconductor laser, simply fabricated by UV-nanoimprint lithography (UV-NIL), that is pumped with a pulsed InGaN LED is demonstrated. Molecular weight optimization of the polymer gain medium on a nanoimprinted polymer distributed feedback resonator enables the lowest reported UV-NIL laser threshold density of 770 W cm(-2) , establishing the potential for scalable organic laser fabrication compatible with mass-produced LEDs. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  10. Set Size and Mask Duration Do Not Interact in Object-Substitution Masking

    Science.gov (United States)

    Argyropoulos, Ioannis; Gellatly, Angus; Pilling, Michael; Carter, Wakefield

    2013-01-01

    Object-substitution masking (OSM) occurs when a mask, such as four dots that surround a brief target item, onsets simultaneously with the target and offsets a short time after the target, rather than simultaneously with it. OSM is a reduction in accuracy of reporting the target with the temporally trailing mask, compared with the simultaneously…

  11. Excimer laser beam delivery systems for medical applications

    Science.gov (United States)

    Kubo, Uichi; Hashishin, Yuichi; Okada, Kazuyuki; Tanaka, Hiroyuki

    1993-05-01

    We have been doing the basic experiments of UV laser beams and biotissue interaction with both KrF and XeCl lasers. However, the conventional optical fiber can not be available for power UV beams. So we have been investigating about UV power beam delivery systems. These experiments carry on with the same elements doped quartz fibers and the hollow tube. The doped elements are OH ion, chlorine and fluorine. In our latest work, we have tried ArF excimer laser and biotissue interactions, and the beam delivery experiments. From our experimental results, we found that the ArF laser beam has high incision ability for hard biotissue. For example, in the case of the cow's bone incision, the incision depth by ArF laser was ca.15 times of KrF laser. Therefore, ArF laser would be expected to harden biotissue therapy as non-thermal method. However, its beam delivery is difficult to work in this time. We will develop ArF laser beam delivery systems.

  12. Laser discrimination by stimulated emission of a phosphor

    Science.gov (United States)

    Mathur, V. K.; Chakrabarti, K.

    1991-01-01

    A method for discriminating sources of UV, near infrared, and far infrared laser radiation was discovered. This technology is based on the use of a single magnesium sulfide phosphor doubly doped with rare earth ions, which is thermally/optically stimulated to generate colors correlatable to the incident laser radiation. The phosphor, after initial charging by visible light, exhibits green stimulated luminescence when exposed to a near infrared source (Nd: YAG laser). On exposure to far infrared sources (CO2 laser) the phosphor emission changes to orange color. A UV laser produces both an orange red as well as green color. A device using this phosphor is useful for detecting the laser and for discriminating between the near infrared, far infrared, and UV lasers. The technology is also capable of infrared laser diode beam profiling since the radiation source leaves an imprint on the phosphor that can be photographed. Continued development of the technology offers potential for discrimination between even smaller bandwidths within the infrared spectrum, a possible aid to communication or wavemixing devices that need to rapidly identify and process optical signals.

  13. Study on Writing Transmission Metal Grating with Pulse Shaping of Femtosecond Laser

    International Nuclear Information System (INIS)

    Ni, X C; Sun, Q; Wang, Ch Y; Yang, L; Wu, Y Z; Jia, W; Chai, L

    2006-01-01

    Pulse shaping in femtosecond(fs) laser micromachining is different from that of traditional laser, whose main purpose is to reduce focal scale size, wipe off fluorescence around laser beam, decrease pulse distortion, and fabricate all kinds of figures. To describe the spatial form of laser pulse around focal scale, the synchronous moving of focal objective and accepting material is presented. When a pinhole mask is placed in front of focal objective, the changing trend of laser spatial form around focal point with the laser beam diameter will be obtained by the diameter changing of the hole mask. Experimental results show that the diameter of laser pulse around focal point trends smoothly when the pinhole diameter is modulated to smaller, even the position of beam waist is changed. These phenomena can be explained by optical imaging theory. Finally, the transmission metal grating is written successfully with a selected parameter

  14. Applicability of UV laser-induced solid-state fluorescence spectroscopy for characterization of solid dosage forms.

    Science.gov (United States)

    Woltmann, Eva; Meyer, Hans; Weigel, Diana; Pritzke, Heinz; Posch, Tjorben N; Kler, Pablo A; Schürmann, Klaus; Roscher, Jörg; Huhn, Carolin

    2014-10-01

    High production output of solid pharmaceutical formulations requires fast methods to ensure their quality. Likewise, fast analytical procedures are required in forensic sciences, for example at customs, to substantiate an initial suspicion. We here present the design and the optimization of an instrumental setup for rapid and non-invasive characterization of tablets by laser-induced fluorescence spectroscopy (with a UV-laser (λ ex = 266 nm) as excitation source) in reflection geometry. The setup was first validated with regard to repeatability, bleaching phenomena, and sensitivity. The effect on the spectra by the physical and chemical properties of the samples, e.g. their hardness, homogeneity, chemical composition, and granule grain size of the uncompressed material, using a series of tablets, manufactured in accordance with design of experiments, was investigated. Investigation of tablets with regard to homogeneity, especially, is extremely important in pharmaceutical production processes. We demonstrate that multiplicative scatter correction is an appropriate tool for data preprocessing of fluorescence spectra. Tablets with different physical and chemical characteristics can be discriminated well from their fluorescence spectra by subjecting the results to principal component analysis.

  15. Autofluorescence of pigmented skin lesions using a pulsed UV laser with synchronized detection: clinical results

    Science.gov (United States)

    Cheng, Haynes P. H.; Svenmarker, Pontus; Xie, Haiyan; Tidemand-Lichtenberg, Peter; Jensen, Ole B.; Bendsoe, Niels; Svanberg, Katarina; Petersen, Paul Michael; Pedersen, Christian; Andersson-Engels, Stefan; Andersen, Peter E.

    2010-04-01

    We report preliminary clinical results of autofluorescence imaging of malignant and benign skin lesions, using pulsed 355 nm laser excitation with synchronized detection. The novel synchronized detection system allows high signal-tonoise ratio to be achieved in the resulting autofluorescence signal, which may in turn produce high contrast images that improve diagnosis, even in the presence of ambient room light. The synchronized set-up utilizes a compact, diode pumped, pulsed UV laser at 355 nm which is coupled to a CCD camera and a liquid crystal tunable filter. The excitation and image capture is sampled at 5 kHz and the resulting autofluorescence is captured with the liquid crystal filter cycling through seven wavelengths between 420 nm and 580 nm. The clinical study targets pigmented skin lesions and evaluates the prospects of using autofluorescence as a possible means in differentiating malignant and benign skin tumors. Up to now, sixteen patients have participated in the clinical study. The autofluorescence images, averaged over the exposure time of one second, will be presented along with histopathological results. Initial survey of the images show good contrast and diagnostic results show promising agreement based on the histopathological results.

  16. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  17. Optical Protection Filters for Harmful Laser Beams and UV Radiation

    Science.gov (United States)

    Azim M., Osama A.

    2007-02-01

    Due to the rapid growth of radiation protection applications in various devices and instruments, it is essential to use suitable filters for eye protection of the personal working in the radiation field. Different protection filters were produced to protect from four laser beam wavelengths (at 532nm, 632.8nm, 694nm and 1064nm) and block three UV bands (UVA, UVB, and UVC). The design structure of the required dielectric multilayer filters used optical thin film technology. The computer analyses of the multilayer filter formulas were prepared using Macleod Software for the production filter processes. The deposition technique was achieved on optical substrates (Glass BK-7 and Infrasil 301) by dielectric material combinations including Dralo (mixture of oxides TiO2/Al2O3), and Lima (mixture of oxides SiO2/Al2O3); deposition by an electron beam gun. The output transmittance curves for both theoretical and experimental values of all filters are presented. To validate the suitability for use in a `real world', rather than laboratory test application, full environmental assessment was also carried out. These filters exhibited high endurance after exposing them to the durability tests (adhesion, abrasion resistance and humidity) according to military standards MIL-C-675C and MIL-C-48497A.

  18. Optical Protection Filters for Harmful Laser Beams and UV Radiation

    International Nuclear Information System (INIS)

    Azim M, Osama A.

    2007-01-01

    Due to the rapid growth of radiation protection applications in various devices and instruments, it is essential to use suitable filters for eye protection of the personal working in the radiation field. Different protection filters were produced to protect from four laser beam wavelengths (at 532nm, 632.8nm, 694nm and 1064nm) and block three UV bands (UVA, UVB, and UVC). The design structure of the required dielectric multilayer filters used optical thin film technology. The computer analyses of the multilayer filter formulas were prepared using Macleod Software for the production filter processes. The deposition technique was achieved on optical substrates (Glass BK-7 and Infrasil 301) by dielectric material combinations including Dralo (mixture of oxides TiO2/Al2O3), and Lima (mixture of oxides SiO2/Al2O3); deposition by an electron beam gun. The output transmittance curves for both theoretical and experimental values of all filters are presented. To validate the suitability for use in a 'real world', rather than laboratory test application, full environmental assessment was also carried out. These filters exhibited high endurance after exposing them to the durability tests (adhesion, abrasion resistance and humidity) according to military standards MIL-C-675C and MIL-C-48497A

  19. International Conference: Fundamentals of Laser Assisted Micro- & Nanotechnologies (FLAMN-07). Workshop: Laser Cleaning and Artworks Conservation (LCAC). St. Petersburg, Russia, 25-28 June 2007. Abstracts

    Science.gov (United States)

    2007-06-28

    DIKETONATE OF EUROPIUM (EUFOD3) CONFINED IN MICROPOROUS GLASS: UV LASER INDUCED LUMINESCENCE KINETICS AND QUANTUM YIELD...efficiency of controllable laser thermal cleavage of insulating materials,” J.Opt.Technol. 71, 117-120 (2004). WEDNESDAY, JUNE 27 Laser-induced static...PS2_23 B-diketonate of europium (EuFOD3) confined in microporous glass: UV laser induced luminescence kinetics and quantum yield Chutko E.A.1

  20. Masks in Pedagogical Practice

    Science.gov (United States)

    Roy, David

    2016-01-01

    In Drama Education mask work is undertaken and presented as both a methodology and knowledge base. There are numerous workshops and journal articles available for teachers that offer knowledge or implementation of mask work. However, empirical examination of the context or potential implementation of masks as a pedagogical tool remains…

  1. Keeping African Masks Real

    Science.gov (United States)

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  2. Quantitative Detection of Combustion Species using Ultra-Violet Diode Lasers

    Science.gov (United States)

    Pilgrim, J. S.; Peterson, K. A.

    2001-01-01

    Southwest Sciences is developing a new microgravity combustion diagnostic based on UV diode lasers. The instrument will allow absolute concentration measurements of combustion species on a variety of microgravity combustion platforms including the Space Station. Our approach uses newly available room temperature UV diode lasers, thereby keeping the instrument compact, rugged and energy efficient. The feasibility of the technique was demonstrated by measurement of CH radicals in laboratory flames. Further progress in fabrication technology of UV diode lasers at shorter wavelengths and higher power will result in detection of transient species in the deeper UV. High sensitivity detection of combustion radicals is provided with wavelength modulation absorption spectroscopy.

  3. Modeling of UV laser-induced patterning of ultrathin Co films on bulk SiO2: verification of short- and long-range ordering mechanisms

    Science.gov (United States)

    Trice, Justin; Favazza, Christopher; Kalyanaraman, Ramki; Sureshkumar, R.

    2006-03-01

    Irradiating ultrathin Co films (1 to 10 nm) by a short-pulsed UV laser leads to pattern formation with both short- and long-range order (SRO, LRO). Single beam irradiation produces SRO, while two-beam interference irradiation produces a quasi-2D arrangement of nanoparticles with LRO and SRO. The pattern formation primarily occurs in the molten phase. An estimate of the thermal behavior of the film/substrate composite following a laser pulse is presented. The thermal behavior includes the lifetime of the liquid phase and the thermal gradient during interference heating. Based on this evidence, the SRO is attributed to spinodal dewetting of the film while surface tension gradients induced by the laser interference pattern appear to influence LRO [1]. [1] C.Favazza, J.Trice, H.Krishna, R.Sureshkumar, and R.Kalyanaraman, unpublished.

  4. Krypton fluoride laser mirror study. Final report, October 1978-November 1979

    International Nuclear Information System (INIS)

    Flint, B.K.; Najmi, A.; Stelmack, L.A.

    1979-12-01

    Rare gas halide lasers at 193 and 248/nm will require lower-loss optics if mirrors ad windows are not to be limiting factors in advanced DOE applications in laser fusion and photochemistry. This project addresses this problem in a number of ways, including materials investigations, test coatings, and fabrication of new uv laser coating designs, as described in more detail in the previous quarterly reports. Described in the final report are the process of making uv laser mirrors and the experimental strategy for attempting to improve them. Materials research is essential, and included selection and deposition of several condidate materials and an approximate ranking of their optical properties, so that new material combinations could be chosen, computer simulated, and deposited using improved vacuum techniques. Analysis of the electric fields within a laser mirror were employed to lower coating loss. A summary of test data is included, along with remarks on the survivability of uv laser optics, and possible future areas of inquiry, if truly low-loss uv laser mirrors are to ever be developed

  5. Masks: The Artist in Me

    Science.gov (United States)

    Skophammer, Karen

    2009-01-01

    Whether masks are made from cardboard, papier-mache, metal, wood, leather, fabric, clay or any combination of these materials, they bring out the artist in people. Young children like to wear masks when they play to pretend they were another person or animal. Masks let them fantasize and be creative. The author's students made masks representing…

  6. Optimized phase mask to realize retro-reflection reduction for optical systems

    Science.gov (United States)

    He, Sifeng; Gong, Mali

    2017-10-01

    Aiming at the threats to the active laser detection systems of electro-optical devices due to the cat-eye effect, a novel solution is put forward to realize retro-reflection reduction in this paper. According to the demands of both cat-eye effect reduction and the image quality maintenance of electro-optical devices, a symmetric phase mask is achieved from a stationary phase method and a fast Fourier transform algorithm. Then, based on a comparison of peak normalized cross-correlation (PNCC) between the different defocus parameters, the optimal imaging position can be obtained. After modification with the designed phase mask, the cat-eye effect peak intensity can be reduced by two orders of magnitude while maintaining good image quality and high modulation transfer function (MTF). Furthermore, a practical design example is introduced to demonstrate the feasibility of our proposed approach.

  7. Supreme Laryngeal Mask Airway versus Face Mask during Neonatal Resuscitation: A Randomized Controlled Trial.

    Science.gov (United States)

    Trevisanuto, Daniele; Cavallin, Francesco; Nguyen, Loi Ngoc; Nguyen, Tien Viet; Tran, Linh Dieu; Tran, Chien Dinh; Doglioni, Nicoletta; Micaglio, Massimo; Moccia, Luciano

    2015-08-01

    To assess the effectiveness of supreme laryngeal mask airway (SLMA) over face mask ventilation for preventing need for endotracheal intubation at birth. We report a prospective, randomized, parallel 1:1, unblinded, controlled trial. After a short-term educational intervention on SLMA use, infants ≥34-week gestation and/or expected birth weight ≥1500 g requiring positive pressure ventilation (PPV) at birth were randomized to resuscitation by SLMA or face mask. The primary outcome was the success rate of the resuscitation devices (SLMA or face mask) defined as the achievement of an effective PPV preventing the need for endotracheal intubation. We enrolled 142 patients (71 in SLMA and 71 in face mask group, respectively). Successful resuscitation rate was significantly higher with the SLMA compared with face mask ventilation (91.5% vs 78.9%; P = .03). Apgar score at 5 minutes was significantly higher in SLMA than in face mask group (P = .02). Neonatal intensive care unit admission rate was significantly lower in SLMA than in face mask group (P = .02). No complications related to the procedure occurred. In newborns with gestational age ≥34 weeks and/or expected birth weight ≥1500 g needing PPV at birth, the SLMA is more effective than face mask to prevent endotracheal intubation. The SLMA is effective in clinical practice after a short-term educational intervention. Registered with ClinicalTrials.gov: NCT01963936. Copyright © 2015 Elsevier Inc. All rights reserved.

  8. UV spectroscopy. Ch. 16

    International Nuclear Information System (INIS)

    Stevens, Eugene S.

    1991-01-01

    The use of synchrotron radiation (SR) in the ultraviolet (UV) region by biophysics and biophysical chemists continues to increase as access improves and as awareness of its unique combination of properties grows. SR is continuously tunable, intense (even in the UV region), and pulsed. Pulse characteristics are comparable to those of picosecond lasers, but have the advantage of being independent of wavelength. Drawbacks are the continuous, but slow, decay of intensity arising from loss of particles in the ring, and the intrinsic limitation in pulse repetition rate. The particular combination of features that makes SR a superior light source depends upon the application. Spectroscopic techniques based on absorption and some techniques based on emission exploit its intensity and continuous tunability; time resolved techniques make use of its pulse characteristics. This chapter is a status report on two of the major biological applications of UV SR, circular dichroism and time-resolved fluorescence, covering mainly the published literature of the last five years. For the present purpose, the term UV is understood to include the vacuum ultraviolet region to 100 nm. (author). 83 refs.; 4 figs.; 6 tabs

  9. Effect of mask dead space and occlusion of mask holes on delivery of nebulized albuterol.

    Science.gov (United States)

    Berlinski, Ariel

    2014-08-01

    Infants and children with respiratory conditions are often prescribed bronchodilators. Face masks are used to facilitate the administration of nebulized therapy in patients unable to use a mouthpiece. Masks incorporate holes into their design, and their occlusion during aerosol delivery has been a common practice. Masks are available in different sizes and different dead volumes. The aim of this study was to compare the effect of different degrees of occlusion of the mask holes and different mask dead space on the amount of nebulized albuterol available at the mouth opening in a model of a spontaneously breathing child. A breathing simulator mimicking infant (tidal volume [VT] = 50 mL, breathing frequency = 30 breaths/min, inspiratory-expiratory ratio [I:E] = 1:3), child (VT = 155 mL, breathing frequency = 25 breaths/min, I:E = 1:2), and adult (VT = 500 mL, breathing frequency = 15 breaths/min, I:E = 1:2) breathing patterns was connected to a collection filter hidden behind a face plate. A pediatric size mask and an adult size mask connected to a continuous output jet nebulizer were sealed to the face plate. Three nebulizers were loaded with albuterol sulfate (2.5 mg/3 mL) and operated with 6 L/min compressed air for 5 min. Experiments were repeated with different degrees of occlusion (0%, 50%, and 90%). Albuterol was extracted from the filter and measured with a spectrophotometer at 276 nm. Occlusion of the holes in the large mask did not increase the amount of albuterol in any of the breathing patterns. The amount of albuterol captured at the mouth opening did not change when the small mask was switched to the large mask, except with the breathing pattern of a child, and when the holes in the mask were 50% occluded (P = .02). Neither decreasing the dead space of the mask nor occluding the mask holes increased the amount of nebulized albuterol captured at the mouth opening.

  10. Fabrication and stability of fiber bragg gratings for WDM applications using a 266 nm cw-laser

    DEFF Research Database (Denmark)

    Deyerl, Hans-Jürgen; Sørensen, Henrik Rokkjær; Jensen, Jesper Bo Damm

    2003-01-01

    Diode pumped continuous wave all solid state UV-lasers operating at 266 nm offer an interesting alternative to frequency doubled argon ion lasers. We compare photosensitivity, UV-writing of Bragg gratings and thermal decay at 244, 257 and 266 nm.......Diode pumped continuous wave all solid state UV-lasers operating at 266 nm offer an interesting alternative to frequency doubled argon ion lasers. We compare photosensitivity, UV-writing of Bragg gratings and thermal decay at 244, 257 and 266 nm....

  11. Detecting Kerogen as a Biosignature Using Colocated UV Time-Gated Raman and Fluorescence Spectroscopy.

    Science.gov (United States)

    Shkolyar, Svetlana; Eshelman, Evan J; Farmer, Jack D; Hamilton, David; Daly, Michael G; Youngbull, Cody

    2018-04-01

    The Mars 2020 mission will analyze samples in situ and identify any that could have preserved biosignatures in ancient habitable environments for later return to Earth. Highest priority targeted samples include aqueously formed sedimentary lithologies. On Earth, such lithologies can contain fossil biosignatures as aromatic carbon (kerogen). In this study, we analyzed nonextracted kerogen in a diverse suite of natural, complex samples using colocated UV excitation (266 nm) time-gated (UV-TG) Raman and laser-induced fluorescence spectroscopies. We interrogated kerogen and its host matrix in samples to (1) explore the capabilities of UV-TG Raman and fluorescence spectroscopies for detecting kerogen in high-priority targets in the search for possible biosignatures on Mars; (2) assess the effectiveness of time gating and UV laser wavelength in reducing fluorescence in Raman spectra; and (3) identify sample-specific issues that could challenge rover-based identifications of kerogen using UV-TG Raman spectroscopy. We found that ungated UV Raman spectroscopy is suited to identify diagnostic kerogen Raman bands without interfering fluorescence and that UV fluorescence spectroscopy is suited to identify kerogen. These results highlight the value of combining colocated Raman and fluorescence spectroscopies, similar to those obtainable by SHERLOC on Mars 2020, to strengthen the confidence of kerogen detection as a potential biosignature in complex natural samples. Key Words: Raman spectroscopy-Laser-induced fluorescence spectroscopy-Mars Sample Return-Mars 2020 mission-Kerogen-Biosignatures. Astrobiology 18, 431-453.

  12. Optimizing UV laser focus profiles for improved MALDI performance.

    Science.gov (United States)

    Holle, Armin; Haase, Andreas; Kayser, Markus; Höhndorf, Jens

    2006-06-01

    Matrix assisted laser desorption/ionization (MALDI) applications, such as proteomics, genomics, clinical profiling and MALDI imaging, have created a growing demand for faster instrumentation. Since the commonly used nitrogen lasers have throughput and life span limitations, diode-pumped solid-state lasers are an alternative. Unfortunately this type of laser shows clear performance limitations in MALDI in terms of sensitivity, resolution and ease of use, for applications such as thin-layer sample preparations, acceptance of various matrices (e.g. DHB for glycopeptides) and MALDI imaging. While it is obvious that the MALDI process has some dependence on the characteristics of the laser used, it is unclear which features are the most critical in determining laser performance for MALDI. In this paper we show, for the first time, that a spatially structured laser beam profile in lieu of a Gaussian profile is of striking importance. This result enabled us to design diode-pumped Nd : YAG lasers that on various critical applications perform as well for MALDI as the nitrogen lasers and in some respects even better. The modulation of the beam profile appears to be a new parameter for optimizing the MALDI process. In addition, the results trigger new questions directing us to a better understanding of the MALDI process. Copyright (c) 2006 John Wiley & Sons, Ltd.

  13. Instantaneous phase-shifting Fizeau interferometry with high-speed pixelated phase-mask camera

    Science.gov (United States)

    Yatagai, Toyohiko; Jackin, Boaz Jessie; Ono, Akira; Kiyohara, Kosuke; Noguchi, Masato; Yoshii, Minoru; Kiyohara, Motosuke; Niwa, Hayato; Ikuo, Kazuyuki; Onuma, Takashi

    2015-08-01

    A Fizeou interferometer with instantaneous phase-shifting ability using a Wollaston prism is designed. to measure dynamic phase change of objects, a high-speed video camera of 10-5s of shutter speed is used with a pixelated phase-mask of 1024 × 1024 elements. The light source used is a laser of wavelength 532 nm which is split into orthogonal polarization states by passing through a Wollaston prism. By adjusting the tilt of the reference surface it is possible to make the reference and object beam with orthogonal polarizations states to coincide and interfere. Then the pixelated phase-mask camera calculate the phase changes and hence the optical path length difference. Vibration of speakers and turbulence of air flow were successfully measured in 7,000 frames/sec.

  14. Gestalt grouping and common onset masking.

    Science.gov (United States)

    Kahan, Todd A; Mathis, Katherine M

    2002-11-01

    A four-dot mask that surrounds and is presented simultaneously with a briefly presented target will reduce a person's ability to identity that target if the mask persists beyond target offset and attention is divided (Enns & Di Lollo, 1997, 2000). This masking effect, referred to as common onset masking, reflects reentrant processing in the visual system and can best be explained with a theory of object substitution (Di Lollo, Enns, & Rensink, 2000). In the present experiments, we investigated whether Gestalt grouping variables would influence the strength of common onset masking. The results indicated that (1) masking was impervious to grouping by form, similarity of color, position, luminance polarity, and common region and (2) masking increased with the number of elements in the masking display.

  15. Enhanced UV photoresponse of KrF-laser-synthesized single-wall carbon nanotubes/n-silicon hybrid photovoltaic devices.

    Science.gov (United States)

    Le Borgne, V; Gautier, L A; Castrucci, P; Del Gobbo, S; De Crescenzi, M; El Khakani, M A

    2012-06-01

    We report on the KrF-laser ablation synthesis, purification and photocurrent generation properties of single-wall carbon nanotubes (SWCNTs). The thermally purified SWCNTs are integrated into hybrid photovoltaic (PV) devices by spin-coating them onto n-Si substrates. These novel SWCNTs/n-Si hybrid devices are shown to generate significant photocurrent (PC) over the entire 250-1050 nm light spectrum with external quantum efficiencies (EQE) reaching up to ~23%. Our SWCNTs/n-Si hybrid devices are not only photoactive in the traditional spectral range of Si solar cells, but generate also significant PC in the UV domain (below 400 nm). This wider spectral response is believed to be the result of PC generation from both the SWCNTs themselves and the tremendous number of local p-n junctions created at the nanotubes/Si interface. To assess the prevalence of these two contributions, the EQE spectra and J-V characteristics of these hybrid devices were investigated in both planar and top-down configurations, as a function of SWCNTs' film thickness. A sizable increase in EQE in the near UV with respect to the silicon is observed in both configurations, with a more pronounced UV photoresponse in the planar mode, confirming thereby the role of SWCNTs in the photogeneration process. The PC generation is found to reach its maximum for an optimal the SWCNT film thickness, which is shown to correspond to the best trade-off between lowest electrical resistance and highest optical transparency. Finally, by analyzing the J-V characteristics of our SWCNTs/n-Si devices with an equivalent circuit model, we were able to point out the contribution of the various electrical components involved in the photogeneration process. The SWCNTs-based devices demonstrated here open up the prospect for their use in highly effective photovoltaics and/or UV-light sensors.

  16. High efficiency metal marking with CO2 laser and glass marking with excimer laser

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    with a thoroughly tested ray-tracing model is presented and compared with experimental results. Special emphasis is put on two different applications namely marking in metal with TEA-CO2 laser and marking in glass with excimer laser. The results are evaluated on the basis of the achievable energy enhancement......Today, mask based laser materials processing and especially marking is widely used. However, the energy efficiency in such processes is very low [1].This paper gives a review of the results, that may be obtained using the energy enhancing technique [1]. Results of simulations performed...

  17. Mechanical alignment of substrates to a mask

    Science.gov (United States)

    Webb, Aaron P.; Carlson, Charles T.; Honan, Michael; Amato, Luigi G.; Grant, Christopher Neil; Strassner, James D.

    2016-11-08

    A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

  18. Comparison of Ventilation With One-Handed Mask Seal With an Intraoral Mask Versus Conventional Cuffed Face Mask in a Cadaver Model: A Randomized Crossover Trial.

    Science.gov (United States)

    Amack, Andrew J; Barber, Gary A; Ng, Patrick C; Smith, Thomas B; April, Michael D

    2017-01-01

    We compare received minute volume with an intraoral mask versus conventional cuffed face mask among medics obtaining a 1-handed mask seal on a cadaver model. This study comprised a randomized crossover trial of adult US Army combat medic volunteers participating in a cadaver laboratory as part of their training. We randomized participants to obtain a 1-handed mask seal during ventilation of a fresh unembalmed cadaver, first using either an intraoral airway device or conventional cuffed face mask. Participants obtained a 1-handed mask seal while a ventilator delivered 10 standardized 750-mL breaths during 1 minute. After a 5-minute rest period, they repeated the study with the alternative mask. The primary outcome measure was received minute volume as measured by a respirometer. Of 27 recruited participants, all completed the study. Median received minute volume was higher with the intraoral mask compared with conventional cuffed mask by 1.7 L (95% confidence interval 1.0 to 1.9 L; Pcadaver model. The intraoral mask may prove a useful airway adjunct for ventilation. Copyright © 2016 American College of Emergency Physicians. Published by Elsevier Inc. All rights reserved.

  19. Manufacture of a conformal multilayer rf antenna substrate using excimer mask imaging technology and a 6-axis robot

    Science.gov (United States)

    Charrier, Michel; Everett, Daniel; Fieret, Jim; Karrer, Tobias; Rau, Sven; Valard, Jean-Luc

    2001-06-01

    A novel method is presented to produce a high precision pattern of copper tracks on both sides of a 4-layer conformal radar antenna made of PEI polymer and shaped as a truncated pseudo-parabolic cylinder. The antenna is an active emitter-receiver so that an accuracy of a fraction of the wavelength of the microwave radiation is required. After 2D layer design in Allegro, the resulting Gerber file-format circuits are wrapped around the antenna shape, resulting in a cutter-path file which provides the input for a postprocessor that outputs G-code for robot- and laser control. A rules file contains embedded information such as laser parameters and mask aperture related to the Allegro symbols. The robot consists of 6 axes that manipulate the antenna, and 2 axes for the mask plate. The antenna can be manipulated to an accuracy of +/- 20 micrometers over its full dimensions of 200x300x50 mm. The four layers are constructed by successive copper coating, resist coating, laser ablation, copper etching, resist removal, insulation polyimide film lamination and laser dielectric drilling for microvia holes and through-holes drilling. Applications are in space and aeronautical communication and radar detection systems, with possible extensions to automotive and mobile hand-sets, and land stations.

  20. Femtosecond laser fabrication of microspike-arrays on tungsten surface

    International Nuclear Information System (INIS)

    Sano, Tomokazu; Yanai, Masato; Ohmura, Etsuji; Nomura, Yasumitsu; Miyamoto, Isamu; Hirose, Akio; Kobayashi, Kojiro F.

    2005-01-01

    Microspike-arrays were fabricated by irradiating a femtosecond laser on a tungsten surface through a mask opening in air. The natural logarithms of the calculated intensity distributions diffracted at the edge of the mask opening were qualitatively consistent with the experimental results of the shape and arrays of microspikes fabricated. The shape and the array of microspikes depend on the intensity distribution diffracted at the edge of the mask opening. This microspike-array has the potential to be used as a source of micro emitter tips

  1. UV laser ablation of intraocular lenses: SEM and AFM microscopy examination of the biomaterial surface

    International Nuclear Information System (INIS)

    Spyratou, E.; Asproudis, I.; Tsoutsi, D.; Bacharis, C.; Moutsouris, K.; Makropoulou, M.; Serafetinides, A.A.

    2010-01-01

    Several new materials and patterns are studied for the formation and etching of intraocular lenses (IOLs), in order to improve their optical properties, to reduce the diffractive aberrations and to decrease the incidence of posterior capsular opacification. The aim of this study is to investigate the use of UV (λ = 266 nm) laser pulses to ablate the intraocular lenses materials, and thus to provide an alternative to conventional surface shaping techniques for IOLs fabrication. Ablation experiments were conducted using various polymer substrates of hydrophobic acrylic IOLs and PMMA IOLs. We investigated the ablation efficiency and the morphology of the ablated area by imaging the surface modification with atomic force microscopy (AFM) and scanning electron microscopy (SEM). The morphological appearance of IOL samples reveals the effect of a photochemical and photothermal ablation mechanism.

  2. UV laser ablation of intraocular lenses: SEM and AFM microscopy examination of the biomaterial surface

    Energy Technology Data Exchange (ETDEWEB)

    Spyratou, E., E-mail: ellas5@central.ntua.gr [National Technical University of Athens, School of Applied Mathematical and Physical Sciences, Department of Physics, Zografou Campus, Athens, 15780 (Greece); Asproudis, I. [Department of Ophthalmology, University Hospital of Ioannina, Ioannina, 45110 (Greece); Tsoutsi, D. [Department of Chemistry, University of Ioannina, Ioannina, 45110 (Greece); Bacharis, C.; Moutsouris, K.; Makropoulou, M.; Serafetinides, A.A. [National Technical University of Athens, School of Applied Mathematical and Physical Sciences, Department of Physics, Zografou Campus, Athens, 15780 (Greece)

    2010-02-01

    Several new materials and patterns are studied for the formation and etching of intraocular lenses (IOLs), in order to improve their optical properties, to reduce the diffractive aberrations and to decrease the incidence of posterior capsular opacification. The aim of this study is to investigate the use of UV ({lambda} = 266 nm) laser pulses to ablate the intraocular lenses materials, and thus to provide an alternative to conventional surface shaping techniques for IOLs fabrication. Ablation experiments were conducted using various polymer substrates of hydrophobic acrylic IOLs and PMMA IOLs. We investigated the ablation efficiency and the morphology of the ablated area by imaging the surface modification with atomic force microscopy (AFM) and scanning electron microscopy (SEM). The morphological appearance of IOL samples reveals the effect of a photochemical and photothermal ablation mechanism.

  3. EFFECT OF OPTICAL FIBER HYDROGEN LOADING ON THE INSCRIPTION EFFICIENCY OF CHIRPED BRAGG GRATINGS BY MEANS OF KrF EXCIMER LASER RADIATION

    Directory of Open Access Journals (Sweden)

    Sergey V. Varzhel

    2016-11-01

    Full Text Available Subject of Research.We present comparative results of the chirped Bragg gratings inscription efficiency in optical fiber of domestic production with and without low-temperature hydrogen loading. Method. Chirped fiber Bragg gratings inscription was made by the Talbot interferometer with chirped phase mask having a chirp rate of 2.3 nm/cm used for the laser beam amplitude separation. The excimer laser system Coherent COMPexPro 150T, working with the gas mixture KrF (248 nm, was used as the radiation source. In order to increase the UV photosensitivity, the optical fiber was placed in a chamber with hydrogen under a pressure of 10 MPa and kept there for 14 days at 40 °C. Main Results. The usage of the chirped phase mask in a Talbot interferometer scheme has made it possible to get a full width at half-maximum of the fiber Bragg grating reflection spectrum of 3.5 nm with induced diffraction structure length of 5 mm. By preliminary hydrogen loading of optical fiber the broad reflection spectrum fiber Bragg gratings with a reflectivity close to 100% has been inscribed. Practical Relevance. The resulting chirped fiber Bragg gratings can be used as dispersion compensators in optical fiber communications, as well as the reflective elements of distributed fiber-optic phase interferometric sensors.

  4. Laser dentistry: A new application of excimer laser in root canal therapy

    International Nuclear Information System (INIS)

    Pini, R.; Salimbeni, R.; Vannini, M.; Barone, R.; Clauser, C.

    1989-01-01

    We report the first study of the application of excimer lasers in dentistry for the treatment of dental root canals. High-energy ultraviolet (UV) radiation emitted by an XeCl excimer laser (308 nm) and delivered through suitable optical fibers can be used to remove residual organic tissue from the canals. To this aim, UV ablation thresholds of dental tissues have been measured, showing a preferential etching of infiltrated dentin in respect to healthy dentin, at laser fluences of 0.5-1.5 J/cm 2 . This technique has been tested on extracted tooth samples, simulating a clinical procedure. Fibers of decreasing core diameters have been used to treat different sections of the root canal down to its apical portion, resulting in an effective, easy, and fast cleaning action. Possible advantages of excimer laser clinical applications in respect to usual procedures are also discussed

  5. Mask quality assessment

    Science.gov (United States)

    Regis, Larry; Paulson, Neil; Reynolds, James A.

    1994-02-01

    Product quality and timely delivery are two of the most important parameters, determining the success of a mask manufacturing facility. Because of the sensitivity of this data, however, very little is known about industry performance in these areas. Using Arthur Andersen & Co. to protect contributor identity, the authors have conducted a blind quality survey of mask shops which represents over 75% of the total merchant and captive mask volume in the US. Quantities such as return rate, plate survival yield, performance to schedule and reason for return were requested from 1988 through Q2 1993. Data is analyzed and conclusions are presented.

  6. An etching mask and a method to produce an etching mask

    DEFF Research Database (Denmark)

    2016-01-01

    The present invention relates to an etching mask comprising silicon containing block copolymers produced by self-assembly techniques onto silicon or graphene substrate. Through the use of the etching mask, nanostructures having long linear features having sub-10 nm width can be produced....

  7. Tunable ultraviolet solid-state dye laser based on MPMMA doped with pyrromethene 597

    International Nuclear Information System (INIS)

    Jiang, Y G; Fan, R W; Xia, Y Q; Chen, D Y

    2011-01-01

    Solid-state dye sample based on modified polymethyl methacrylate (MPMMA) co-doped with pyrromethene 597 (PM597), and coumarin 460 (C460) were prepared. A frequency-doubled pulsed Nd:YAG laser is used to pump solid-state dye sample, and the narrow linewidth dye laser of 94.4 mJ was obtained at 582 nm in an oscillator-amplifier configuration. Using a beta-BaB 2 O 4 (BBO) crystal to frequency double the dye laser into ultraviolet (UV), a tuning range from 279 to 305 nm was demonstrated from a single doped PM597 dye. To the best of our knowledge, the UV tuning range is the best under the same condition so far. The conversion slope efficiency from solid dye laser to UV laser was 8.9% and the highest UV laser output energy reached 6.94 mJ at 291 nm

  8. Masks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y.

    1998-01-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed

  9. Nanotechnology in lithium niobate for integrated optic frequency conversion in the UV

    Science.gov (United States)

    Busacca, Alessandro C.; Santini, Claudia; Oliveri, Luigi; Riva-Sanseverino, Stefano; Parisi, Antonino; Cino, Alfonso C.; Assanto, Gaetano

    2017-11-01

    In the domain of Earth Explorer satellites nanoengineered nonlinear crystals can optimize UV tunable solid-state laser converters. Lightweight sources can be based on Lithium Niobate (LN) domain engineering by electric field poling and guided wave interactions. In this Communication we report the preliminary experimental results and the very first demonstration of UltraViolet second-harmonic generation by first-order quasi-phase-matching in a surface-periodically-poled proton-exchanged LN waveguide. The pump source was a Ti-Sapphire laser with a tunability range of 700- 980 nm and a 40 GHz linewidth. We have measured UV continuous-wave light at 390 nm by means of a lock-in amplifier and of a photodiode with enhanced response in the UV. Measured conversion efficiency was about 1%W-1cm-2. QPM experiments show good agreement with theory and pave the way for a future implementation of the technique in materials less prone to photorefractive damage and wider transparency in the UV, such as Lithium Tantalate.

  10. Time-resolved analysis of DNA-protein interactions in living cells by UV laser pulses.

    Science.gov (United States)

    Nebbioso, Angela; Benedetti, Rosaria; Conte, Mariarosaria; Carafa, Vincenzo; De Bellis, Floriana; Shaik, Jani; Matarese, Filomena; Della Ventura, Bartolomeo; Gesuele, Felice; Velotta, Raffaele; Martens, Joost H A; Stunnenberg, Hendrik G; Altucci, Carlo; Altucci, Lucia

    2017-09-15

    Interactions between DNA and proteins are mainly studied through chemical procedures involving bi-functional reagents, mostly formaldehyde. Chromatin immunoprecipitation is used to identify the binding between transcription factors (TFs) and chromatin, and to evaluate the occurrence and impact of histone/DNA modifications. The current bottleneck in probing DNA-protein interactions using these approaches is caused by the fact that chemical crosslinkers do not discriminate direct and indirect bindings or short-lived chromatin occupancy. Here, we describe a novel application of UV laser-induced (L-) crosslinking and demonstrate that a combination of chemical and L-crosslinking is able to distinguish between direct and indirect DNA-protein interactions in a small number of living cells. The spatial and temporal dynamics of TF bindings to chromatin and their role in gene expression regulation may thus be assessed. The combination of chemical and L-crosslinking offers an exciting and unprecedented tool for biomedical applications.

  11. UV-laser microdissection and mRNA expression analysis of individual neurons from postmortem Parkinson's disease brains.

    Science.gov (United States)

    Gründemann, Jan; Schlaudraff, Falk; Liss, Birgit

    2011-01-01

    Cell specificity of gene expression analysis is essential to avoid tissue sample related artifacts, in particular when the relative number of target cells present in the compared tissues varies dramatically, e.g., when comparing dopamine neurons in midbrain tissues from control subjects with those from Parkinson's disease (PD) cases. Here, we describe a detailed protocol that combines contact-free UV-laser microdissection and quantitative PCR of reverse-transcribed RNA of individual neurons from postmortem human midbrain tissue from PD patients and unaffected controls. Among expression changes in a variety of dopamine neuron marker, maintenance, and cell-metabolism genes, we found that α-synuclein mRNA levels were significantly elevated in individual neuromelanin-positive dopamine midbrain neurons from PD brains when compared to those from matched controls.

  12. Excimer Laser Curing Of Polymer Coatings

    Science.gov (United States)

    Klick, David; Akerman, M. Alfred; Paul, George L.; Supurovic, Darko; Tsuda, Haruki

    1988-12-01

    The use of the excimer laser as a source of energy for photo-assisted curing of industrial polymeric coatings was investigated. Presently, UV lamps are sometimes used to excite a photoinitiating molecule mixed with the starting monomers and oligomers of a coating. The resulting polymeric chain reaction multiplies the effect of the initial photons, making economical use of the light source. The high cost of laser photons may thus be justifiable if lasers provide advantages over lamps. A series of visibly transparent 7 μm coatings (a typical thickness for 'slick' magazine coatings) with various photoinitiators, monomers, and oligomers was illuminated with excimer laser light of various wavelengths, fluences, and pulse repetition rates. For the optimum parameters, it was found that the laser had large advantages in curing speed over existing UV lamp processes, due to its monochromaticity. Pigmented coatings (20 μm TiO2 mixtures typical of appliance or automotive finishes) are not easily cured with UV lamps due to the inability of light to penetrate the absorbing and scattering pigmented layer. However, economically-viable cure rates were achieved with certain photoinitiators using a tunable excimer-pumped dye laser. A prototype of such a laser suitable for factory use was built and used to cure these coatings. Results are scaled to a factory situation, and costs are calculated to show the advantages of the laser method over currently used processes.

  13. An oral TRPV1 antagonist attenuates laser radiant-heat-evoked potentials and pain ratings from UV(B)-inflamed and normal skin.

    Science.gov (United States)

    Schaffler, Klaus; Reeh, Peter; Duan, W Rachel; Best, Andrea E; Othman, Ahmed A; Faltynek, Connie R; Locke, Charles; Nothaft, Wolfram

    2013-02-01

    Laser (radiant-heat) evoked potentials (LEPs) from vertex-EEG peak-to-peak (PtP) amplitude were used to determine acute antinociceptive/antihyperalgesic efficacy of ABT-102, a novel TRPV1 antagonist efficacious in preclinical pain models, compared with active controls and placebo in normal and UV(B)-inflamed skin. This was a randomized, placebo- and active-controlled, double-blind, intra-individual, crossover trial. Twenty-four healthy subjects received six sequences of single doses of ABT-102 (0.5, 2, 6 mg), etoricoxib 90 mg, tramadol 100 mg and placebo. Painful stimuli were induced by CO(2) -laser on normal and UV(B) -inflamed skin. LEPs and visual analogue scale (VAS-pain) ratings were taken at baseline and hourly up to 8 h post-dose from both skin types. Compared with placebo, significant mean decreases in the primary variable of LEP PtP-amplitude from UV(B)-inflamed skin were observed with ABT-102 6 mg (P < 0.001), ABT-102 2 mg (P = 0.002), tramadol 100 mg (P < 0.001), and etoricoxib 90 mg (P = 0.001) over the 8 h period; ABT-102 0.5 mg was similar to placebo. ABT-102 6 mg was superior to active controls over the 8 h period (P < 0.05) whereas ABT-102 2 mg was comparable. Improvements in VAS scores compared with placebo were observed with ABT-102 6 mg (P < 0.001) and ABT-102 2 mg (P = 0.002). ABT-102 average plasma concentrations were 1.3, 4.4 and 9.4 ng ml(-1) for the 0.5, 2 and 6 mg doses, respectively. There were no clinically significant safety findings. TRPV-1 antagonism appears promising in the management of clinical pain, but requires further investigation. © 2012 Abbott. British Journal of Clinical Pharmacology © 2012 The British Pharmacological Society.

  14. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  15. Laser Diagnostics for Reacting Flows

    National Research Council Canada - National Science Library

    Hanson, Ronald K

    2007-01-01

    ... (UV) or infrared (IR) wavelengths. The cw lasers were spectrally narrow, allowing study of innovative diagnostics based on spectral lineshapes, while the pulsed lasers provided intense bursts of photons needed for techniques based on LIF...

  16. Fabrication of micro- and nano-structured materials using mask-less processes

    International Nuclear Information System (INIS)

    Roy, Sudipta

    2007-01-01

    Micro- and nano-scale devices are used in electronics, micro-electro- mechanical, bio-analytical and medical components. An essential step for the fabrication of such small scale devices is photolithography. Photolithography requires a master mask to transfer micrometre or sub-micrometre scale patterns onto a substrate. The requirement of a physical, rigid mask can impede progress in applications which require rapid prototyping, flexible substrates, multiple alignment and 3D fabrication. Alternative technologies, which do not require the use of a physical mask, are suitable for these applications. In this paper mask-less methods of micro- and nano-scale fabrication have been discussed. The most common technique, which is the laser direct imaging (LDI), technique has been applied to fabricate micrometre scale structures on printed circuit boards, glass and epoxy. LDI can be combined with chemical methods to deposit metals, inorganic materials as well as some organic entities at the micrometre scale. Inkjet technology can be used to fabricate micrometre patterns of etch resists, organic transistors as well as arrays for bioanalysis. Electrohydrodynamic atomisation is used to fabricate micrometre scale ceramic features. Electrochemical methodologies offer a variety of technical solutions for micro- and nano-fabrication owing to the fact that electron charge transfer can be constrained to a solid-liquid interface. Electrochemical printing is an adaptation of inkjet printing which can be used for rapid prototyping of metallic circuits. Micro-machining using nano-second voltage pulses have been used to fabricate high precision features on metals and semiconductors. Optimisation of reactor, electrochemistry and fluid flow (EnFACE) has also been employed to transfer micrometre scale patterns on a copper substrate. Nano-scale features have been fabricated by using specialised tools such as scanning tunnelling microscopy, atomic force microscopy and focused ion beam. The

  17. Tritium decontamination from co-deposited layer on tungsten substrate by ultra violet lamp and laser

    International Nuclear Information System (INIS)

    Oya, Yasuhisa; Tadokoro, Takahiro; Shu, Wataru; Hayashi, Takumi; O'hira, Shigeru; Nishi, Masataka

    2001-01-01

    Tritium decontamination using ultra violet (UV) lamp and laser was performed. Simulated co-deposited layer on tungsten substrate was deposited by C 2 H 2 or C 2 D 2 glow discharge. The co-deposited layer was irradiated to UV lights from a xenon excimer lamp (172 nm) or ArF excimer laser (193 nm) and the in-situ decontamination behavior was evaluated by a mass spectrometer. After the UV irradiation, the hydrogen concentration in the co-deposited layer was evaluated by elastic recoil detection analysis (ERDA) and the depth profile was analyzed by secondary ion mass spectrometry (SIMS). For the co-deposited layer formed by C 2 D 2 glow discharge, it was found that M/e 3 (HD) gas was released mainly during the UV lamp irradiation while both M/e 3 (HD) and M/e 4 (D 2 ) gases were detected during the UV laser irradiation. Though the co-deposited layer was not removed by UV lamp irradiation, almost all the co-deposited layer was removed by UV laser irradiation within 1 min. The ratio of hydrogen against carbon in the co-deposited layer was estimated to be 0.53 by ERDA and the number of photon needed for removing 1 μm thick co-deposited layer was calculated to be 3.7x10 18 cm -2 for the UV laser by SIMS measurement. It is concluded that C-H (C-D) bond on the co-deposited layer were dissociated by irradiation of UV lamp while the co-deposited layer itself was removed by the UV laser irradiation. (author)

  18. A compact OPO/SFG laser for ultraviolet biological sensing

    Science.gov (United States)

    Tiihonen, Mikael; Pasiskevicius, Valdas; Laurell, Fredrik; Jonsson, Per; Lindgren, Mikael

    2004-07-01

    A compact parametric oscillator (OPO) with intracavity sum-frequency generation (SFG) to generate 293 nm UV laser irradiation, was developed. The OPO/SFG device was pumped by a 100 Hz Nd:YAG laser (1064 nm) of own design, including subsequent second harmonic generation (SHG) in an external periodically poled KTiOPO4 (KTP) crystal. The whole system could be used to deliver more than 30 μJ laser irradiation per pulse (100 Hz) at 293 nm. The UV laser light was introduced in an optical fiber attached to a sample compartment allowing detection of fluorescence emission using a commercial spectrometer. Aqueous samples containing biomolecules (ovalbumin) or bacteria spores (Bacillus subtilis) were excited by the UV-light at 293 nm resulting in strong fluorescence emission in the range 325 - 600 nm.

  19. High resolution UV spectroscopy and laser-focused nanofabrication

    NARCIS (Netherlands)

    Myszkiewicz, G.

    2005-01-01

    This thesis combines two at first glance different techniques: High Resolution Laser Induced Fluorescence Spectroscopy (LIF) of small aromatic molecules and Laser Focusing of atoms for Nanofabrication. The thesis starts with the introduction to the high resolution LIF technique of small aromatic

  20. Mask_explorer: A tool for exploring brain masks in fMRI group analysis.

    Science.gov (United States)

    Gajdoš, Martin; Mikl, Michal; Mareček, Radek

    2016-10-01

    Functional magnetic resonance imaging (fMRI) studies of the human brain are appearing in increasing numbers, providing interesting information about this complex system. Unique information about healthy and diseased brains is inferred using many types of experiments and analyses. In order to obtain reliable information, it is necessary to conduct consistent experiments with large samples of subjects and to involve statistical methods to confirm or reject any tested hypotheses. Group analysis is performed for all voxels within a group mask, i.e. a common space where all of the involved subjects contribute information. To our knowledge, a user-friendly interface with the ability to visualize subject-specific details in a common analysis space did not yet exist. The purpose of our work is to develop and present such interface. Several pitfalls have to be avoided while preparing fMRI data for group analysis. One such pitfall is spurious non-detection, caused by inferring conclusions in the volume of a group mask that has been corrupted due to a preprocessing failure. We describe a MATLAB toolbox, called the mask_explorer, designed for prevention of this pitfall. The mask_explorer uses a graphical user interface, enables a user-friendly exploration of subject masks and is freely available. It is able to compute subject masks from raw data and create lists of subjects with potentially problematic data. It runs under MATLAB with the widely used SPM toolbox. Moreover, we present several practical examples where the mask_explorer is usefully applied. The mask_explorer is designed to quickly control the quality of the group fMRI analysis volume and to identify specific failures related to preprocessing steps and acquisition. It helps researchers detect subjects with potentially problematic data and consequently enables inspection of the data. Copyright © 2016 Elsevier Ireland Ltd. All rights reserved.

  1. Evolution of Oxygen Deficiency Center on Fused Silica Surface Irradiated by Ultraviolet Laser and Posttreatment

    Directory of Open Access Journals (Sweden)

    Hai-Bing Lü

    2014-01-01

    Full Text Available Evolution of oxygen deficiency centers (ODCs on a fused silica surface irradiated using a 355 nm ultraviolet (UV laser beam in both vacuum and atmospheric conditions was quantitatively studied using photoluminescence and X-ray photoelectron spectroscopy. When the fusedsilica surface was exposed to the UV laser in vacuum, the laser damage threshold was decreased whereas the concentration of the ODCs was increased. For the fuse silica operated under the high power lasers, creation of ODCs on their surface resulted from the UV laser irradiation, and this is more severe in a high vacuum. The laser fluence and/or laser intensity have significant effects on the increase of the ODCs concentration. The ODCs can be effectively repaired using postoxygen plasma treatment and UV laser irradiation in an excessive oxygen environment. Results also demonstrated that the “gain” and “loss” of oxygen at the silica surface is a reversible and dynamic process.

  2. Two-photon excited whispering-gallery mode ultraviolet laser from an individual ZnO microneedle

    Science.gov (United States)

    Zhu, G. P.; Xu, C. X.; Zhu, J.; Lv, C. G.; Cui, Y. P.

    2009-02-01

    Wurtzite structural ZnO microneedles with hexagonal cross section were fabricated by vapor-phase transport method and an individual microneedle was employed as a lasing microcavity. Under excitation of a femtosecond pulse laser with 800 nm wavelength, the ultraviolet (UV) laser emission was obtained, which presented narrow linewidth and high Q value. The UV emission, resonant mechanism, and laser mode characteristics were discussed in detail. The results demonstrated that the UV laser originated from the whispering-gallery mode induced by two-photon absorption assisted by Rabi oscillation.

  3. Simultaneous pure-tone masking : the dependence of masking asymmetries on intensity

    NARCIS (Netherlands)

    Vogten, L.L.M.

    1978-01-01

    Phase locking between probe and masker was used in a series of pure-tone masking experiments. The masker was a stationary sine wave of variable frequency; the probe a fixed-frequency tone burst. We have observed that for small frequency separation the masking behaves asymmetrically around the probe

  4. Fire ignition during laser surgery in pet rodents

    Directory of Open Access Journals (Sweden)

    Collarile Tommaso

    2012-09-01

    Full Text Available Abstract Background Laser surgery is an attractive alternative to other means of section device in terms of tissue inflammation and interaction, which has been extensively used in human and veterinary medicine. Although accidental ignition during laser surgeries is sporadically reported in human medical literature, to the authors’ knowledge this is the first report regarding laser-dependent fire ignition during surgery in veterinary medicine. Case presentation Two rodents, a 13-month old, 27-gram, male pet mouse (Mus musculus and a 1-year old, female Russian hamster (Phodopus sungorus, underwent surgical removal of masses with diode laser. During the surgical procedures fires ignited from the face masks. The mouse presented severe burns on the head and both forelimbs, it was hospitalized and approximately 2 months after surgery burns were resolved. The hamster presented severe burns on the face and the proximal regions of the body. At 72 hours from the accident the hamster was euthanized. Conclusion The present report suggests that fire ignition is a potential life-threatening complication of laser surgery in non-intubated rodents maintained under volatile anesthesia. High oxygen concentrations, the presence of combustible, and the narrowness of the surgical field with the face mask during laser surgery on rodents are risk factors for fire ignition.

  5. Ion yields in UV-MALDI mass spectrometry as a function of excitation laser wavelength and optical and physico-chemical properties of classical and halogen-substituted MALDI matrixes.

    Science.gov (United States)

    Soltwisch, Jens; Jaskolla, Thorsten W; Hillenkamp, Franz; Karas, Michael; Dreisewerd, Klaus

    2012-08-07

    The laser wavelength constitutes a key parameter in ultraviolet-matrix-assisted laser desorption ionization-mass spectrometry (UV-MALDI-MS). Optimal analytical results are only achieved at laser wavelengths that correspond to a high optical absorption of the matrix. In the presented work, the wavelength dependence and the contribution of matrix proton affinity to the MALDI process were investigated. A tunable dye laser was used to examine the wavelength range between 280 and 355 nm. The peptide and matrix ion signals recorded as a function of these irradiation parameters are displayed in the form of heat maps, a data representation that furnishes multidimensional data interpretation. Matrixes with a range of proton affinities from 809 to 866 kJ/mol were investigated. Among those selected are the standard matrixes 2,5-dihydroxybenzoic acid (DHB) and α-cyano-4-hydroxycinnamic acid (HCCA) as well as five halogen-substituted cinnamic acid derivatives, including the recently introduced 4-chloro-α-cyanocinnamic acid (ClCCA) and α-cyano-2,4-difluorocinnamic acid (DiFCCA) matrixes. With the exception of DHB, the highest analyte ion signals were obtained toward the red side of the peak optical absorption in the solid state. A stronger decline of the molecular analyte ion signals generated from the matrixes was consistently observed at the low wavelength side of the peak absorption. This effect is mainly the result of increased fragmentation of both analyte and matrix ions. Optimal use of multiply halogenated matrixes requires adjustment of the excitation wavelength to values below that of the standard MALDI lasers emitting at 355 (Nd:YAG) or 337 nm (N(2) laser). The combined data provide new insights into the UV-MALDI desorption/ionization processes and indicate ways to improve the analytical sensitivity.

  6. Design of Data Masking Architecture and Analysis of Data Masking Techniques for Testing

    OpenAIRE

    Ravikumar G K,; Manjunath T. N,; Ravindra S. Hegadi,; Archana.R.A

    2011-01-01

    Data masking is the process of obscuring-masking, specific data elements within data stores. It ensures that sensitive data is replaced with realistic but not real data. The goal is that sensitive customer information is not available outside of the authorized environment. Data masking is typically done while provisioning nonproduction environments so that copies created to support test and development processes are not exposing sensitive information and thus avoiding risks of leaking. Maskin...

  7. Mask ventilation with two different face masks in the delivery room for preterm infants: a randomized controlled trial.

    Science.gov (United States)

    Cheung, D; Mian, Q; Cheung, P-Y; O'Reilly, M; Aziz, K; van Os, S; Pichler, G; Schmölzer, G M

    2015-07-01

    If an infant fails to initiate spontaneous breathing after birth, international guidelines recommend a positive pressure ventilation (PPV). However, PPV by face mask is frequently inadequate because of leak between the face and mask. Despite a variety of available face masks, none have been prospectively compared in a randomized fashion. We aimed to evaluate and compare leak between two commercially available round face masks (Fisher & Paykel (F&P) and Laerdal) in preterm infants mask PPV in the delivery room routinely had a flow sensor placed between the mask and T-piece resuscitator. Infants were randomly assigned to receive PPV with either a F&P or Laerdal face mask. All resuscitators were trained in the use of both face masks. We compared mask leak, airway pressures, tidal volume and ventilation rate between the two groups. Fifty-six preterm infants (n=28 in each group) were enrolled; mean±s.d. gestational age 28±3 weeks; birth weight 1210±448 g; and 30 (52%) were male. Apgar scores at 1 and 5 min were 5±3 and 7±2, respectively. Infants randomized to the F&P face mask and Laerdal face mask had similar mask leak (30 (25-38) versus 35 (24-46)%, median (interquartile range), respectively, P=0.40) and tidal volume (7.1 (4.9-8.9) versus 6.6 (5.2-8.9) ml kg(-1), P=0.69) during PPV. There were no significant differences in ventilation rate, inflation time or airway pressures between groups. The use of either face mask during PPV in the delivery room yields similar mask leak in preterm infants <33 weeks gestational age.

  8. Cavity-mirror degradation in the deep-UV FEL

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, K.; Yamazaki, T.; Sei, N. [Electrotechnical Lab., Ibaraki (Japan)] [and others

    1995-12-31

    It is known that the degradation of dielectric multilayer mirrors used in short wavelength free-electron lasers (FELs) is caused by the carbon contamination on the mirror surface and the defects inside the dielectrics. We reported last year that the degraded dielectric multilayer mirrors can be repaired with both surface treatment by RF-induced oxygen plasma and thermal annealing. However, such a mirror degradation is still one of the most critical issues in the deep ultraviolet (UV) FELs, because the fundamental undulator radiation resonating in the laser cavity, the intensity of which is much higher than that of higher harmonics, can be sufficiently energetic to cause the mirror degradation through photochemical reactions. We are investigating the mirror degradation mainly in the deep UV region down to 240 nm. The experimental results will be shown. The mirror degradation mechanism will be discussed.

  9. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  10. Free-electron lasers in ultraviolet photobiology

    International Nuclear Information System (INIS)

    Coohill, T.P.; Sutherland, J.C.

    1989-01-01

    The potential uses for a free-electron laser (FEL), tunable in wavelength from 10 to 400 nm, for photobiological experiments is discussed. Inherent problems of cell and molecular absorption, especially in certain regions of the ultraviolet (UV), are addressed. Absorption values for living cells and viruses at selected wavelengths in the UV are tabulated, and a calculation of the flux needed to inactivate mammalian cells is included. A comparison is made of the UV output of a proposed rf-linac FEL with those of a monochromator, a tunable dye laser, and a synchrotron. The advantages of a UV FEL are apparent, especially in the wavelength regions where the cross section for absorption by biological molecules is low, i.e., 300 to 400 nm and 10 to 200 nm. It is apparent that a UV FEL would be an ideal source for a variety of biological studies that use both intact organisms and isolated cells and viruses

  11. Simulations of a FIR Oscillator with Large Slippage parameter at Jefferson Lab for FIR/UV pump-probe experiments

    International Nuclear Information System (INIS)

    Benson, Stephen V.; Campbell, L. T.; McNeil, B.W.T.; Neil, George R.; Shinn, Michelle D.; Williams, Gwyn P.

    2014-01-01

    We previously proposed a dual FEL configuration on the UV Demo FEL at Jefferson Lab that would allow simultaneous lasing at FIR and UV wavelengths. The FIR source would be an FEL oscillator with a short wiggler providing diffraction-limited pulses with pulse energy exceeding 50 microJoules, using the exhaust beam from a UVFEL as the input electron beam. Since the UV FEL requires very short pulses, the input to the FIR FEL is extremely short compared to a slippage length and the usual Slowly Varying Envelope Approximation (SVEA) does not apply. We use a non-SVEA code to simulate this system both with a small energy spread (UV laser off) and with large energy spread (UV laser on)

  12. How do different brands of size 1 laryngeal mask airway compare with face mask ventilation in a dedicated laryngeal mask airway teaching manikin?

    Science.gov (United States)

    Tracy, Mark Brian; Priyadarshi, Archana; Goel, Dimple; Lowe, Krista; Huvanandana, Jacqueline; Hinder, Murray

    2018-05-01

    International neonatal resuscitation guidelines recommend the use of laryngeal mask airway (LMA) with newborn infants (≥34 weeks' gestation or >2 kg weight) when bag-mask ventilation (BMV) or tracheal intubation is unsuccessful. Previous publications do not allow broad LMA device comparison. To compare delivered ventilation of seven brands of size 1 LMA devices with two brands of face mask using self-inflating bag (SIB). 40 experienced neonatal staff provided inflation cycles using SIB with positive end expiratory pressure (PEEP) (5 cmH 2 O) to a specialised newborn/infant training manikin randomised for each LMA and face mask. All subjects received prior education in LMA insertion and BMV. 12 415 recorded inflations for LMAs and face masks were analysed. Leak detected was lowest with i-gel brand, with a mean of 5.7% compared with face mask (triangular 42.7, round 35.7) and other LMAs (45.5-65.4) (p<0.001). Peak inspiratory pressure was higher with i-gel, with a mean of 28.9 cmH 2 O compared with face mask (triangular 22.8, round 25.8) and other LMAs (14.3-22.0) (p<0.001). PEEP was higher with i-gel, with a mean of 5.1 cmH 2 O compared with face mask (triangular 3.0, round 3.6) and other LMAs (0.6-2.6) (p<0.001). In contrast to other LMAs examined, i-gel had no insertion failures and all users found i-gel easy to use. This study has shown dramatic performance differences in delivered ventilation, mask leak and ease of use among seven different brands of LMA tested in a manikin model. This coupled with no partial or complete insertion failures and ease of use suggests i-gel LMA may have an expanded role with newborn resuscitation as a primary resuscitation device. © Article author(s) (or their employer(s) unless otherwise stated in the text of the article) 2018. All rights reserved. No commercial use is permitted unless otherwise expressly granted.

  13. A Novel system for the production of immobilisation face masks for radiotherapy

    International Nuclear Information System (INIS)

    Deans, T.; McKernan, B.

    2004-01-01

    Full text: Patient immobilisation is critically important for the radiation treatment of Head and Neck cancers. Immobilisation masks can be made from either thermoplastics or vacuumed polycarbonate taken from a plaster 'positive' mould. To create the positive mould, our Radiation Oncology Department has traditionally used Plaster of Paris impressions. This process is time consuming, messy and stressful for the patient. This presentation describes an alternative method for the creation of the positive mould which was developed at this hospital, which is much quicker than previous methods and which obviates all stress to the patient. The patient's face is scanned in the Department of Radiation Oncology using one of a new generation of lightweight, hand-held, laser surface scanners. This process takes a few seconds. The digital information captured by the scanner characterising the patient's face is then emailed to the Department of Medical Technology and Physics (MTP), where a software package is used to manipulate the information into a form suitable for use as input to a Computerised Numerical Control Vertical Machining Centre (CNC-VMC). The CNC-VMC then automatically mills a mould of the patient's face from a block of machineable Plaster of Paris. Two mechanical technicians have undergone specialised training in the manipulation of the data supplied by the scanner into the CNC-VMC format. Proof of principle of this method was established nearly four years ago, with the first patient face mould being produced in February 2004. Since that time more than 100 moulds for face masks have been produced. Typically moulds are delivered to Radiation Oncology within ninety minutes of an email containing patient face data being received in MTP. Approximately half of this time is used for the manipulation of the data provided, while the remaining time is used for the actual automated milling of the mould. This compares with an average time of in excess of 40 hours for

  14. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

    Science.gov (United States)

    Hector, Scott

    2005-11-01

    The extension of optical projection lithography through immersion to patterning features with half pitch face the challenge of being profitable in the small market for mask equipment while encountering significant R&D expenses to bring new generations of mask fabrication equipment to market. The total available market for patterned masks is estimated to be $2.5B to $2.9B per year. The patterned mask market is about 20% of the market size for lithography equipment and materials. The total available market for mask-making equipment is estimated to be about $800M per year. The largest R&D affordability issue arises for the makers of equipment for fabricating masks where total available sales are typically less than ten units per year. SEMATECH has used discounted cash flow models to predict the affordable R&D while maintaining industry accepted internal rates of return. The results have been compared to estimates of the total R&D cost to bring a new generation of mask equipment to market for various types of tools. The analysis revealed that affordability of the required R&D is a significant problem for many suppliers of mask-making equipment. Consortia such as SEMATECH and Selete have played an important role in cost sharing selected mask equipment and material development projects. Governments in the United States, in Europe and in Japan have also helped equipment suppliers with support for R&D. This paper summarizes the challenging business model for mask equipment suppliers and highlight government support for mask equipment and materials development.

  15. Calibration of the central jet chamber of the OPAL detector with UV laser beams: Methods and results on jet chamber prototypes (FSP)

    International Nuclear Information System (INIS)

    Hauschild, M.

    1988-11-01

    The central tracking device of the OPAL experiment at the LEP e + e - -collider consists of a pictorial jet chamber with a diameter of 4 m and 4 m length. The calibration of such a large detector is performed by the help of a UV laser system generating straight tracks even in the presence of magnetic fields. Intensive investigations of the laser calibration power and performance were done at the Full Scale Prototype (FSP) of the OPAL jet chamber. Laser double tracks with a precisely known distance are used to determine the drift velocity with an accuracy of 0.1%. From the measured deviations of a straight laser track electronic time offsets, wire positions and field distortions are derived. These calibration constants were applied to correct the measured drift times of test beam events. The sagitta and momentum resolutions of the thus corrected tracks have been obtained in the range from 6 GeV/c to 50 GeV/c. Extrapolating the results to the final OPAL jet chamber, a momentum resolution of σ-p/p = 6% is expected for 50 GeV/c tracks in a magnetic field of 4 kG. (orig.) [de

  16. BaY2F8 single crystals doped with rare-earth ions as promising up-conversion media for UV and VUV lasers

    International Nuclear Information System (INIS)

    Pushkar', A A; Uvarova, T V; Molchanov, V N

    2008-01-01

    BaY 2 F 8 crystals are studied as promising active media for UV and VUV lasers. The up-conversion pumping of rare-earth activators is proposed to solve problems related to the solarisation of the medium and the selection of pump sources. The technology of growing oriented BaY 2 F 8 single crystals is developed and the influence of the crystal orientation on the growth rate and quality of single crystals is determined. (active media)

  17. Ultraviolet /UV/ sensitive phosphors for silicon imaging detectors

    Science.gov (United States)

    Viehmann, W.; Cowens, M. W.; Butner, C. L.

    1981-01-01

    The fluorescence properties of UV sensitive organic phosphors and the radiometric properties of phosphor coated silicon detectors in the VUV, UV, and visible wavelengths are described. With evaporated films of coronene and liumogen, effective quantum efficiencies of up to 20% have been achieved on silicon photodiodes in the vacuum UV. With thin films of methylmethacrylate (acrylic), which are doped with organic laser dyes and deposited from solution, detector quantum efficiencies of the order of 15% for wavelengths of 120-165 nm and of 40% for wavelengths above 190 nm have been obtained. The phosphor coatings also act as antireflection coatings and thereby enhance the response of coated devices throughout the visible and near IR.

  18. Ultra-short laser processing of transparent material at the interface to liquid

    International Nuclear Information System (INIS)

    Boehme, R; Pissadakis, S; Ehrhardt, M; Ruthe, D; Zimmer, K

    2006-01-01

    Similarly to laser-induced backside wet etching (LIBWE) with nanosecond ultraviolet (ns UV) laser pulses, the irradiation of the solid/liquid interface of fused silica with sub-picosecond (sub-ps) UV and femtosecond near infrared (fs NIR) laser pulses results in etching of the fused silica surface and deposition of decomposition products from liquid. Furthermore, the etch threshold is reduced compared with both direct ablation with an fs laser in air and backside etching with UV ns pulses. Using 0.5 M pyrene/toluene as absorbing liquid, the thresholds were determined to be 70 mJ cm -2 (sub-ps UV) and 330 mJ cm -2 (fs NIR). Furthermore, an almost linear increase in the etch rate with increasing laser fluence was found. The roughness of surfaces backside etched with ultra-short pulses is higher in comparison with ns pulses but lower than that obtained using direct fs laser ablation. Hence a combination of processes involved in fs laser ablation and ns backside etching can be expected. The processes at the ultra-short pulse laser irradiated solid/liquid interface are discussed, considering the effects of ultra-fast heating, multi-photon absorption processes, as well as defect generation in the materials

  19. Oral mask ventilation is more effective than face mask ventilation after nasal surgery.

    Science.gov (United States)

    Yazicioğlu, Dilek; Baran, Ilkay; Uzumcugil, Filiz; Ozturk, Ibrahim; Utebey, Gulten; Sayın, M Murat

    2016-06-01

    To evaluate and compare the face mask (FM) and oral mask (OM) ventilation techniques during anesthesia emergence regarding tidal volume, leak volume, and difficult mask ventilation (DMV) incidence. Prospective, randomized, crossover study. Operating room, training and research hospital. American Society of Anesthesiologists physical status I and II adult patients scheduled for nasal surgery. Patients in group FM-OM received FM ventilation first, followed by OM ventilation, and patients in group OM-FM received OM ventilation first, followed by FM ventilation, with spontaneous ventilation after deep extubation. The FM ventilation was applied with the 1-handed EC-clamp technique. The OM was placed only over the mouth, and the 1-handed EC-clamp technique was used again. A child's size FM was used for the OM ventilation technique, the mask was rotated, and the inferior part of the mask was placed toward the nose. The leak volume (MVleak), mean airway pressure (Pmean), and expired tidal volume (TVe) were assessed with each mask technique for 3 consecutive breaths. A mask ventilation grade ≥3 was considered DMV. DMV occurred more frequently during FM ventilation (75% with FM vs 8% with OM). In the FM-first sequence, the mean TVe was 249±61mL with the FM and 455±35mL with the OM (P=.0001), whereas in the OM-first sequence, it was 276±81mL with the FM and 409±37mL with the OM (P=.0001). Regardless of the order used, the OM technique significantly decreased the MVleak and increased the TVe when compared to the FM technique. During anesthesia emergence after nasal surgery the OM may offer an effective ventilation method as it decreases the incidence of DMV and the gas leak around the mask and provides higher tidal volume delivery compared with FM ventilation. Copyright © 2016 Elsevier Inc. All rights reserved.

  20. Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

    Science.gov (United States)

    Pack, Robert C.; Standiford, Keith; Lukanc, Todd; Ning, Guo Xiang; Verma, Piyush; Batarseh, Fadi; Chua, Gek Soon; Fujimura, Akira; Pang, Linyong

    2014-10-01

    A methodology is described wherein a calibrated model-based `Virtual' Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask designs prior to Mask Data Preparation (MDP) and mask fabrication. This type of verification addresses physical effects which occur in mask writing that may impact lithographic printing fidelity and variability. The work described here is motivated by requirements for extreme accuracy and control of variations for today's most demanding IC products. These extreme demands necessitate careful and detailed analysis of all potential sources of uncompensated error or variation and extreme control of these at each stage of the integrated OPC/ MDP/ Mask/ silicon lithography flow. The important potential sources of variation we focus on here originate on the basis of VSB mask writer physics and other errors inherent in the mask writing process. The deposited electron beam dose distribution may be examined in a manner similar to optical lithography aerial image analysis and image edge log-slope analysis. This approach enables one to catch, grade, and mitigate problems early and thus reduce the likelihood for costly long-loop iterations between OPC, MDP, and wafer fabrication flows. It moreover describes how to detect regions of a layout or mask where hotspots may occur or where the robustness to intrinsic variations may be improved by modification to the OPC, choice of mask technology, or by judicious design of VSB shots and dose assignment.

  1. Fourier phasing with phase-uncertain mask

    International Nuclear Information System (INIS)

    Fannjiang, Albert; Liao, Wenjing

    2013-01-01

    Fourier phasing is the problem of retrieving Fourier phase information from Fourier intensity data. The standard Fourier phase retrieval (without a mask) is known to have many solutions which cause the standard phasing algorithms to stagnate and produce wrong or inaccurate solutions. In this paper Fourier phase retrieval is carried out with the introduction of a randomly fabricated mask in measurement and reconstruction. Highly probable uniqueness of solution, up to a global phase, was previously proved with exact knowledge of the mask. Here the uniqueness result is extended to the case where only rough information about the mask’s phases is assumed. The exponential probability bound for uniqueness is given in terms of the uncertainty-to-diversity ratio of the unknown mask. New phasing algorithms alternating between the object update and the mask update are systematically tested and demonstrated to have the capability of recovering both the object and the mask (within the object support) simultaneously, consistent with the uniqueness result. Phasing with a phase-uncertain mask is shown to be robust with respect to the correlation in the mask as well as the Gaussian and Poisson noises. (paper)

  2. Computing Challenges in Coded Mask Imaging

    Science.gov (United States)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  3. Summation versus suppression in metacontrast masking: On the potential pitfalls of using metacontrast masking to assess perceptual-motor dissociation.

    Science.gov (United States)

    Cardoso-Leite, Pedro; Waszak, Florian

    2014-07-01

    A briefly flashed target stimulus can become "invisible" when immediately followed by a mask-a phenomenon known as backward masking, which constitutes a major tool in the cognitive sciences. One form of backward masking is termed metacontrast masking. It is generally assumed that in metacontrast masking, the mask suppresses activity on which the conscious perception of the target relies. This assumption biases conclusions when masking is used as a tool-for example, to study the independence between perceptual detection and motor reaction. This is because other models can account for reduced perceptual performance without requiring suppression mechanisms. In this study, we used signal detection theory to test the suppression model against an alternative view of metacontrast masking, referred to as the summation model. This model claims that target- and mask-related activations fuse and that the difficulty in detecting the target results from the difficulty to discriminate this fused response from the response produced by the mask alone. Our data support this alternative view. This study is not a thorough investigation of metacontrast masking. Instead, we wanted to point out that when a different model is used to account for the reduced perceptual performance in metacontrast masking, there is no need to postulate a dissociation between perceptual and motor responses to account for the data. Metacontrast masking, as implemented in the Fehrer-Raab situation, therefore is not a valid method to assess perceptual-motor dissociations.

  4. Poisson-Spot Intensity Reduction with a Partially-Transparent Petal-Shaped Optical Mask

    Science.gov (United States)

    Shiri, Shahram; Wasylkiwskyj, Wasyl

    2013-01-01

    The presence of Poisson's spot, also known as the spot of Arago, formed along the optical axis in the geometrical shadow behind an obstruction, has been known since the 18th century. The presence of this spot can best be described as the consequence of constructive interference of light waves diffracted on the edge of the obstruction where its central position can··be determined by the symmetry of the object More recently, the elimination of this spot has received attention in the fields of particle physics, high-energy lasers, astronomy and lithography. In this paper, we introduce a novel, partially transparent petaled mask shape that suppresses the bright spot by up to 10 orders of magnitude in intensity, with powerful applications to many of the above fields. The optimization technique formulated in this design can identify mask shapes having partial transparency only near the petal tips.

  5. Binary phase masks on self-developing photopolymers: the technique for formation and testing in an optical correlator

    International Nuclear Information System (INIS)

    Yezhov, P V; Il'in, O A; Smirnova, T N; Tikhonov, E A

    2003-01-01

    Binary phase masks (PMs) of size 256x256 cells with a random distribution of elements, formed on the self-developing FPK-488 photopolymer, are studied. The masks were prepared by the projection method using amplitude transparencies. The phase shift between the mask elements corresponding to the regions of the amplitude transparency with the optical density D = 0 and 2 was (0.85±0.05)π at the wavelength of 0.633 μm. Holographic matched filters were recorded for PMs obtained. The diffraction efficiency of holographic matched PM filters was 40 %. The signal-to-noise ratio for recognition signals for PMs in the Vander Lugt correlator was 20 dB. The normalised power density of the recognition signal is studied as a function of the rotation angle of a PM in the input plane of the Vander Lugt correlator. (laser applications and other topics in quantum electronics)

  6. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  7. Lasing ability of naphthyl 1, 3, 4, oxadiazole molecules in relation with their structures: application to the design of new UV dye laser

    Energy Technology Data Exchange (ETDEWEB)

    Rulliere, C; Rayez, J C [Bordeaux-1 Univ., 33 - Talence (France). Lab. de Chimie Physique A

    1976-11-01

    The lasing properties of naphtyl 1,3,4 oxadiazole derivatives were found to be directly related to the position of the forbidden transition S/sub 0/ ..-->../sup 1/Lsub(b) of naphtalene with respect to the first allowed transitions. The combination of theoretical and experimental results allows us to predict which compounds are most likely to exhibit a laser effect according to the nature and the position of their substituants. This approach was successfully applied to the following compounds: ..cap alpha..NPD, ..beta..NPD, ..cap alpha..NND, ..beta..NND, ..beta..NBD, and ..cap alpha..NBD. In particular we reported the first observation of a laser effect for ..cap alpha..NBD and ..beta..NBD in the UV at 3830 A and 3758 A is reported.

  8. Study of Polymer Material Aging by Laser Mass Spectrometry, UV-Visible Spectroscopy, and Environmental Scanning Electron Microscopy

    Directory of Open Access Journals (Sweden)

    Junien Exposito

    2007-01-01

    Full Text Available Dyed natural rubber (NR and styrene butadiene rubber (SBR, designed for outdoor applications, were exposed to an accelerated artificial aging in xenon light. The aging results in the deterioration of the exposed surface material properties. The ability of dyed polymers to withstand prolonged sunlight exposure without fading or undergoing any physical deterioration is largely determined not only by the photochemical characteristics of the absorbing dyestuff itself but also by the polymer structure and fillers. Results obtained by laser mass spectrometry, UV-visible spectroscopy, and environmental scanning electron microscopy indicate that dyed filled NR and SBR samples behave differently during the photo-oxidation. The fading of the dyed polymers was found to be promoted in the NR sample. This can be correlated with LDI-FTICRMS results, which show the absence of [M-H]− orange pigment pseudomolecular ion and also its fragment ions after aging. This is confirmed by both EDX and UV/Vis spectroscopy. EDX analysis indicates a concentration of chlorine atoms, which can be considered as a marker of orange pigment or its degradation products, only at the surface of SBR flooring after aging. Reactivity of radicals formed during flooring aging has been studied and seems to greatly affect the behavior of such organic pigments.

  9. Time-resolved laser spectroscopy in the UV/VUV spectral region

    International Nuclear Information System (INIS)

    Bengtsson, J.

    1992-01-01

    Radiative lifetimes ranging from 3 to 500 ns were measured on various states of Ag, N, Se, Te and As, by recording the fluorescence light decay after excitation by a laser pulse. Ag was supplied by a collimated atomic beam while Se, Te and As were contained in quartz cells. Pulsed laser radiation, with a wavelength down to 185 nm, was generated by different set-ups, using Nd-YAG pumped dye lasers combined with non-linear crystals and Raman shifting. Short laser pulses were produced by a nitrogen laser or a distributed feedback dye laser. Two-photon processes and stepwise excitation were used to populate high-lying levels. Depletion spectroscopy, quantum-beat spectroscopy and optical double resonance spectroscopy were also performed

  10. Metacontrast masking is processed before grapheme-color synesthesia.

    Science.gov (United States)

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  11. An interactive tool for gamut masking

    Science.gov (United States)

    Song, Ying; Lau, Cheryl; Süsstrunk, Sabine

    2014-02-01

    Artists often want to change the colors of an image to achieve a particular aesthetic goal. For example, they might limit colors to a warm or cool color scheme to create an image with a certain mood or feeling. Gamut masking is a technique that artists use to limit the set of colors they can paint with. They draw a mask over a color wheel and only use the hues within the mask. However, creating the color palette from the mask and applying the colors to the image requires skill. We propose an interactive tool for gamut masking that allows amateur artists to create an image with a desired mood or feeling. Our system extracts a 3D color gamut from the 2D user-drawn mask and maps the image to this gamut. The user can draw a different gamut mask or locally refine the image colors. Our voxel grid gamut representation allows us to represent gamuts of any shape, and our cluster-based image representation allows the user to change colors locally.

  12. THE LOCAL LASER-STIMULATED ELECTRODEPOSITION OF THE NICKEL

    Directory of Open Access Journals (Sweden)

    V. A. Zabludovskyi

    2009-12-01

    Full Text Available The mask-free method for obtaining the local nickel coatings using laser radiation is developed. The parameters of local nickel coatings are calculated. The rate of electroplating process is estimated.

  13. Microfabrication of biomaterials by the sub-ps laser-induced forward transfer process

    International Nuclear Information System (INIS)

    Karaiskou, A.; Zergioti, I.; Fotakis, C.; Kapsetaki, M.; Kafetzopoulos, D.

    2003-01-01

    The precise fabrication of micro-dimensioned patterns of biomaterials by the laser microprinting technique using a sub-ps UV laser is described. An ultrashort UV laser has been used to transfer the biomaterial, with low angular divergence, and deposit it onto the substrate with minimum spread and high spatial resolution. The laser-transferred features of 100 μmx100 μm size have been studied by means of scanning electron microscopy and scanning laser confocal fluorescence microscopy. The analysis of DNA and protein microarrays provides an excellent tool to expand our knowledge of genome functions

  14. Design of TOPAZ masking system using EGS4

    International Nuclear Information System (INIS)

    Uno, Shoji

    1991-01-01

    There are two sources of the beam background in the e + e - collider experiments. One source is the synchrotron radiation from many magnets. Another source comes from the spent-electron hitting the beam pipe near the interaction region. To reduce the these background, TOPAZ masking system was designed using EGS4 code. The designed masking system consists of two pairs of masks which are called mask-1 and mask-2. The mask-1 is placed to intercept the spent-electron. The aperture of the mask-2 was determined for the synchrotron radiation photons not to hit the mask-1 directly. After these masks were installed, we are taking the data in the small beam background. (author)

  15. [Recognition of visual objects under forward masking. Effects of cathegorial similarity of test and masking stimuli].

    Science.gov (United States)

    Gerasimenko, N Iu; Slavutskaia, A V; Kalinin, S A; Kulikov, M A; Mikhaĭlova, E S

    2013-01-01

    In 38 healthy subjects accuracy and response time were examined during recognition of two categories of images--animals andnonliving objects--under forward masking. We revealed new data that masking effects depended of categorical similarity of target and masking stimuli. The recognition accuracy was the lowest and the response time was the most slow, when the target and masking stimuli belongs to the same category, that was combined with high dispersion of response times. The revealed effects were more clear in the task of animal recognition in comparison with the recognition of nonliving objects. We supposed that the revealed effects connected with interference between cortical representations of the target and masking stimuli and discussed our results in context of cortical interference and negative priming.

  16. The near-UV absorber OSSO and its isomers.

    Science.gov (United States)

    Wu, Zhuang; Wan, Huabin; Xu, Jian; Lu, Bo; Lu, Yan; Eckhardt, André K; Schreiner, Peter R; Xie, Changjian; Guo, Hua; Zeng, Xiaoqing

    2018-05-01

    Disulfur dioxide, OSSO, has been proposed as the enigmatic "near-UV absorber" in the yellowish atmosphere of Venus. However, the fundamentally important spectroscopic properties and photochemistry of OSSO are scarcely documented. By either condensing gaseous SO or 266 laser photolysis of an S2O2 complex in Ar or N2 at 15 K, syn-OSSO, anti-OSSO, and cyclic OS([double bond, length as m-dash]O)S were identified by IR and UV/Vis spectroscopy for the first time. The observed absorptions (λmax) for OSSO at 517 and 390 nm coincide with the near-UV absorption (320-400 nm) found in the Venus clouds by photometric measurements with the Pioneer Venus orbiter. Subsequent UV light irradiation (365 nm) depletes syn-OSSO and anti-OSSO and yields a fourth isomer, syn-OSOS, with concomitant dissociation into SO2 and elemental sulfur.

  17. Ultraviolet laser-induced fluorescence detection strategies in capillary electrophoresis: determination of naphthalene sulphonates in river water.

    NARCIS (Netherlands)

    Kok, S.J.; Isberg, I.C.K.; Gooijer, C.; Brinkman, U.A.T.; Velthorst, N.H.

    1998-01-01

    Various UV-laser-induced fluorescence detection strategies for capillary electrophoresis (CE) are compared, i.e. two UV-laser systems (a pulsed laser providing up to 25 mW of tunable emission, applied at 280, 290 and 325 nm, and a continuous wave (cw) laser providing up to 100 mW of 257 nm emission)

  18. A single mask process for the realization of fully-isolated, dual-height MEMS metallic structures separated by narrow gaps

    Science.gov (United States)

    Li, Yuan; Kim, Minsoo; Allen, Mark G.

    2018-02-01

    Multi-height metallic structures are of importance for various MEMS applications, including master molds for creating 3D structures by nanoimprint lithography, or realizing vertically displaced electrodes for out-of-plane electrostatic actuators. Normally these types of multi-height structures require a multi-mask process with increased fabrication complexity. In this work, a fabrication technology is presented in which fully-isolated, dual-height MEMS metallic structures separated by narrow gaps can be realized using a self-aligned, single-mask process. The main scheme of this proposed process is through-mold electrodeposition, where two photoresist mold fabrication steps and two electrodeposition steps are sequentially implemented to define the thinner and thicker structures in the dual-height configuration. The process relies on two self-aligned steps enabled by the electrodeposited thinner structures: a wet-etching of the seed layer utilizing the thinner structure as an etch-mask to electrically isolate the thinner and the thicker structures, and a backside UV lithography utilizing the thinner structure as a lithographic mask to create a high-aspect-ratio mold for the thicker structure through-mold electrodeposition. The latter step requires the metallic structures to be fabricated on a transparent substrate. Test structures with differences in aspect ratio are demonstrated to showcase the capability of the process.

  19. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  20. The Moody Mask Model

    DEFF Research Database (Denmark)

    Larsen, Bjarke Alexander; Andkjær, Kasper Ingdahl; Schoenau-Fog, Henrik

    2015-01-01

    This paper proposes a new relation model, called "The Moody Mask model", for Interactive Digital Storytelling (IDS), based on Franceso Osborne's "Mask Model" from 2011. This, mixed with some elements from Chris Crawford's Personality Models, is a system designed for dynamic interaction between ch...

  1. Spectral narrowing of a 980 nm tapered diode laser bar

    Science.gov (United States)

    Vijayakumar, Deepak; Jensen, Ole Bjarlin; Lucas Leclin, Ga"lle; Petersen, Paul Michael; Thestrup, Birgitte

    2011-03-01

    High power diode laser bars are interesting in many applications such as solid state laser pumping, material processing, laser trapping, laser cooling and second harmonic generation. Often, the free running laser bars emit a broad spectrum of the order of several nanometres which limit their scope in wavelength specific applications and hence, it is vital to stabilize the emission spectrum of these devices. In our experiment, we describe the wavelength narrowing of a 12 element 980 nm tapered diode laser bar using a simple Littman configuration. The tapered laser bar which suffered from a big smile has been "smile corrected" using individual phase masks for each emitter. The external cavity consists of the laser bar, both fast and slow axis micro collimators, smile correcting phase mask, 6.5x beam expanding lens combination, a 1200 lines/mm reflecting grating with 85% efficiency in the first order, a slow axis focusing cylindrical lens of 40 mm focal length and an output coupler which is 10% reflective. In the free running mode, the laser emission spectrum was 5.5 nm wide at an operating current of 30A. The output power was measured to be in excess of 12W. Under the external cavity operation, the wavelength spread of the laser could be limited to 0.04 nm with an output power in excess of 8 W at an operating current of 30A. The spectrum was found to be tuneable in a range of 16 nm.

  2. Brightness masking is modulated by disparity structure.

    Science.gov (United States)

    Pelekanos, Vassilis; Ban, Hiroshi; Welchman, Andrew E

    2015-05-01

    The luminance contrast at the borders of a surface strongly influences surface's apparent brightness, as demonstrated by a number of classic visual illusions. Such phenomena are compatible with a propagation mechanism believed to spread contrast information from borders to the interior. This process is disrupted by masking, where the perceived brightness of a target is reduced by the brief presentation of a mask (Paradiso & Nakayama, 1991), but the exact visual stage that this happens remains unclear. In the present study, we examined whether brightness masking occurs at a monocular-, or a binocular-level of the visual hierarchy. We used backward masking, whereby a briefly presented target stimulus is disrupted by a mask coming soon afterwards, to show that brightness masking is affected by binocular stages of the visual processing. We manipulated the 3-D configurations (slant direction) of the target and mask and measured the differential disruption that masking causes on brightness estimation. We found that the masking effect was weaker when stimuli had a different slant. We suggest that brightness masking is partly mediated by mid-level neuronal mechanisms, at a stage where binocular disparity edge structure has been extracted. Copyright © 2015 The Authors. Published by Elsevier Ltd.. All rights reserved.

  3. Five Wavelength DFB Fibre Laser Source for WDM Systems

    DEFF Research Database (Denmark)

    Hübner, Jörg; Varming, Poul; Kristensen, Martin

    1997-01-01

    Singlemode UV-induced distributed feedback (DFB) fibre lasers with a linewidth of lasers is verified by a 10 Gbit/s transmission experiment. Five DFB fibre lasers are cascaded and pumped by a single...... semiconductor laser, thereby forming a multiwavelength source for WDM systems...

  4. Gilded Silver Mask

    Institute of Scientific and Technical Information of China (English)

    1998-01-01

    This gilded silver mask from the Liao Dynasty is 31 cm long and 22.2 cm wide. The plump oval face was designed with a protruding brow ridge, narrow eyes, high-bridged nose and closed mouth. The chin is slightly round against a thin neck, the ears are long and the hair can be clearly seen from the finely carved lines. The use of masks was recorded as

  5. Narrow linewidth picosecond UV pulsed laser with mega-watt peak power.

    Science.gov (United States)

    Huang, Chunning; Deibele, Craig; Liu, Yun

    2013-04-08

    We demonstrate a master oscillator power amplifier (MOPA) burst mode laser system that generates 66 ps/402.5 MHz pulses with mega-watt peak power at 355 nm. The seed laser consists of a single frequency fiber laser (linewidth laser is operating in a 5-μs/10-Hz macropulse mode. The laser output has a transform-limited spectrum with a very narrow linewidth of individual longitudinal modes. The immediate application of the laser system is the laser-assisted hydrogen ion beam stripping for the Spallation Neutron Source (SNS).

  6. Image-guided, Laser-based Fabrication of Vascular-derived Microfluidic Networks

    OpenAIRE

    Heintz, Keely A.; Mayerich, David; Slater, John H.

    2017-01-01

    This detailed protocol outlines the implementation of image-guided, laser-based hydrogel degradation for the fabrication of vascular-derived microfluidic networks embedded in PEGDA hydrogels. Here, we describe the creation of virtual masks that allow for image-guided laser control; the photopolymerization of a micromolded PEGDA hydrogel, suitable for microfluidic network fabrication and pressure head-driven flow; the setup and use of a commercially available laser scanning confocal microscope...

  7. UV-induced carbon monoxide emission from sand and living vegetation

    DEFF Research Database (Denmark)

    Bruhn, Dan; Albert, Kristian Rost; Mikkelsen, Teis Nørgaard

    2012-01-01

    The global burden of carbon monoxide, CO, is rather uncertain. In this paper we address the potential of UV-induced CO emission by terrestrial surfaces. Real-time measurements of [CO] were made with a cavity enhanced laser connected in closed loop to either an ecosystem chamber or a leaf scale...... chamber. Sand and leaves of all examined plant species exhibited emission of CO in response to artificial UV-radiation and the UV-component of natural solar radiation. The UV-induced rate of CO emission exhibited a rather low dependence on temperature, indicating an abiotic process. The emission of CO...... in response to the UV-component of natural solar radiation was also evident at the ecosystem scale. When scaled to the global level, the UV-induced emission of CO by the major types of terrestrial surfaces, living leaves and soil (here represented by sand), amounts up to 28 Tg yr−1. This source has...

  8. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  9. Fourier-limited seeded soft x-ray laser pulse

    Czech Academy of Sciences Publication Activity Database

    Guilbaud, O.; Tissandier, F.; Goddet, J-P.; Ribière, M.; Sebban, S.; Gautier, J.; Joyeux, D.; Ros, D.; Cassou, K.; Kazamias, S.; Klisnick, A.; Habib, J.; Zeitoun, P.; Benredjem, D.; Mocek, Tomáš; Nejdl, Jaroslav; De Rossi, S.; Maynard, G.; Cros, B.; Boudaa, A.; Calisti, A.

    2010-01-01

    Roč. 35, č. 9 (2010), s. 1326-1328 ISSN 0146-9592 Grant - others:AVČR(CZ) M100100911 Institutional research plan: CEZ:AV0Z10100523 Keywords : lasers and laser optics * UV * EUV * x-ray lasers * spectroscopy Subject RIV: BH - Optics, Masers, Lasers Impact factor: 3.316, year: 2010

  10. Frequency doubled dye laser with a servo-tuned crystal

    Energy Technology Data Exchange (ETDEWEB)

    Kuhl, J; Spitschan, H

    1975-01-01

    Spectral tuning of the uv output of a frequency doubled dye laser was successfully controlled by a servo motor system which tilts the nonlinear crystal appropriate for phase-matched second harmonic generation while the dye laser emission wavelength is tuned. The spatial direction of the generated uv beam was used as the regulating signal. The feasibility of this technique for spectroscopic applications was successfully tested.

  11. Iodine laser of high efficiency and fast repetition rate

    Energy Technology Data Exchange (ETDEWEB)

    Hohla, K; Witte, K J

    1976-07-01

    The scaling laws of an iodine laser of high efficiency and fast repetition rate are reported. The laser is pumped with a new kind of low pressure Hg-UV-lamps which convert 32% of the electrical input in UV-light in the absorption band of the iodine laser and which can be fired up to 100 Hz. Details of a 10 kJ/1 nsec system as dimensions, energy density, repetition rate, flow velocity, gas composition and gas pressure and the overall efficiency are given which is expected to be about 2%.

  12. Are Masking-Based Models of Risk Useful?

    Science.gov (United States)

    Gisiner, Robert C

    2016-01-01

    As our understanding of directly observable effects from anthropogenic sound exposure has improved, concern about "unobservable" effects such as stress and masking have received greater attention. Equal energy models of masking such as power spectrum models have the appeal of simplicity, but do they offer biologically realistic assessments of the risk of masking? Data relevant to masking such as critical ratios, critical bandwidths, temporal resolution, and directional resolution along with what is known about general mammalian antimasking mechanisms all argue for a much more complicated view of masking when making decisions about the risk of masking inherent in a given anthropogenic sound exposure scenario.

  13. Comparison of the OxyMask and Venturi Mask in the Delivery of Supplemental Oxygen: Pilot Study in Oxygen-Dependent Patients

    OpenAIRE

    Beecroft, Jaime M; Hanly, Patrick J

    2006-01-01

    BACKGROUND: The OxyMask (Southmedic Inc, Canada) is a new face mask for oxygen delivery that uses a small ‘diffuser’ to concentrate and direct oxygen toward the mouth and nose. The authors hypothesized that this unique design would enable the OxyMask to deliver oxygen more efficiently than a Venturi mask (Hudson RCI, USA) in patients with chronic hypoxemia.METHODS: Oxygen-dependent patients with chronic, stable respiratory disease were recruited to compare the OxyMask and Venturi mask in a ra...

  14. Comparison of the OxyMask and Venturi mask in the delivery of supplemental oxygen: Pilot study in oxygen-dependent patients

    Science.gov (United States)

    Beecroft, Jaime M; Hanly, Patrick J

    2006-01-01

    BACKGROUND: The OxyMask (Southmedic Inc, Canada) is a new face mask for oxygen delivery that uses a small ‘diffuser’ to concentrate and direct oxygen toward the mouth and nose. The authors hypothesized that this unique design would enable the OxyMask to deliver oxygen more efficiently than a Venturi mask (Hudson RCI, USA) in patients with chronic hypoxemia. METHODS: Oxygen-dependent patients with chronic, stable respiratory disease were recruited to compare the OxyMask and Venturi mask in a randomized, single-blind, cross-over design. Baseline blood oxygen saturation (SaO2) was established breathing room air, followed in a random order by supplemental oxygen through the OxyMask or Venturi mask. Oxygen delivery was titrated to maintain SaO2 4% to 5% and 8% to 9% above baseline for two separate 30 min periods of stable breathing. Oxygen flow rate, partial pressure of inspired and expired oxygen (PO2) and carbon dioxide (PCO2), minute ventilation, heart rate, nasal and oral breathing, SaO2 and transcutaneous PCO2 were collected continuously. The study was repeated following alterations to the OxyMask design, which improved clearance of carbon dioxide. RESULTS: Thirteen patients, aged 28 to 79 years, were studied initially using the original OxyMask. Oxygen flow rate was lower, inspired PO2 was higher and expired PO2 was lower while using the OxyMask. Minute ventilation and inspired and expired PCO2 were significantly higher while using the OxyMask, whereas transcutaneous PCO2, heart rate and the ratio of nasal to oral breathing did not change significantly throughout the study. Following modification of the OxyMask, 13 additional patients, aged 18 to 79 years, were studied using the same protocol. The modified OxyMask provided a higher inspired PO2 at a lower flow rate, without evidence of carbon dioxide retention. CONCLUSIONS: Oxygen is delivered safely and more efficiently by the OxyMask than by the Venturi mask in stable oxygen-dependent patients. PMID:16896425

  15. Mask materials in powderblasting

    NARCIS (Netherlands)

    Wensink, H.; Berenschot, Johan W.; Jansen, Henricus V.; Elwenspoek, Michael Curt

    1999-01-01

    Powderblasting has the opportunity to become a standard technology in micromachining. To machine small details with powderbalsting, it is necessary to use a suiabled mask. In this paper four mask types ares examined. BF400 resist foil is most suitable for standard use in powderblasting for reason of

  16. Separation of nitrogen isotopes by laser light

    Energy Technology Data Exchange (ETDEWEB)

    Izawa, Y; Noguchi, Y; Yamanaka, C [Osaka Univ., Suita (Japan). Faculty of Engineering

    1976-06-01

    The separation experiment on nitrogen isotopes by laser light was made. First, the nitrogen isotopes of /sup 14/N and /sup 15/N in NH/sub 3/ molecules were separated by CO/sub 2/ laser and UV light. The separation factor and the enrichment factor were calculated. It was shown that their pressure dependence was in good agreement with the measured values. The separation factor of about 2% was obtained with UV light of 10/sup 6/W/cm/sup 2/.

  17. Is mask-based stereotactic head-and-neck fixation as precise as stereotactic head fixation for precision radiotherapy?

    International Nuclear Information System (INIS)

    Georg, Dietmar; Bogner, Joachim; Dieckmann, Karin; Poetter, Richard

    2006-01-01

    Background: The aim of this study was to compare setup accuracy and reproducibility of a stereotactic head and a head-and-neck fixation system, both based on thermoplastic material. Methods and Material: Ten patients were immobilized with a head and a head-and-neck fixation system (both BrainLAB, Germany). Both mask systems were modified with a custom-made mouthpiece and a strip of thermoplastic material attached to the lower part of the mask. During the first treatment session, after positioning patients using room lasers, two orthogonal portal images were taken as reference. Later on, at least five sets of orthogonal portal images were acquired for each patient. The isocentric setup accuracy was determined by comparing field edges and anatomic landmarks and the repositioning accuracy in the mask was obtained by comparing individual anatomic landmarks with respect to the metal balls, fixed on the masks. Systematic and random deviations and resulting three-dimensional (3D) vectors were calculated. Additionally, margins were derived from the systematic and random component of the isocentric setup accuracy. Finally, inter- and intraobserver variations were analyzed. Results: The systematic variation of the isocentric setup accuracy was very similar for the two mask systems, but the random variations were slightly larger for the head-and-neck system, resulting in a 0.4-mm larger 3D vector. The repositioning variations for the head mask were smaller compared with the head-and-neck mask, resulting in smaller 3D vectors for the random (∼0.4 mm) and systematic variations (∼0.6 mm). For both mask systems, a 2-mm margin can be used in lateral and anteroposterior direction, whereas in craniocaudal direction, this margin should be extended to 2.5 mm for the head mask and to 3 mm for the head-and-neck mask. The average absolute differences between two observers were within 0.5 mm, maximum deviations around 1 mm. Conclusion: Thermoplastic mask-based stereotactic head

  18. A masking index for quantifying hidden glitches

    OpenAIRE

    Berti-Equille, Laure; Loh, J. M.; Dasu, T.

    2015-01-01

    Data glitches are errors in a dataset. They are complex entities that often span multiple attributes and records. When they co-occur in data, the presence of one type of glitch can hinder the detection of another type of glitch. This phenomenon is called masking. In this paper, we define two important types of masking and propose a novel, statistically rigorous indicator called masking index for quantifying the hidden glitches. We outline four cases of masking: outliers masked by missing valu...

  19. Shadows Alter Facial Expressions of Noh Masks

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  20. Efficient and accurate laser shaping with liquid crystal spatial light modulators

    Energy Technology Data Exchange (ETDEWEB)

    Maxson, Jared M.; Bartnik, Adam C.; Bazarov, Ivan V. [Cornell Laboratory for Accelerator-Based Sciences and Education, Cornell University, Ithaca, New York 14853 (United States)

    2014-10-27

    A phase-only spatial light modulator (SLM) is capable of precise transverse laser shaping by either functioning as a variable phase grating or by serving as a variable mask via polarization rotation. As a phase grating, the highest accuracy algorithms, based on computer generated holograms (CGHs), have been shown to yield extended laser shapes with <10% rms error, but conversely little is known about the experimental efficiency of the method in general. In this work, we compare the experimental tradeoff between error and efficiency for both the best known CGH method and polarization rotation-based intensity masking when generating hard-edged flat top beams. We find that the masking method performs comparably with CGHs, both having rms error < 10% with efficiency > 15%. Informed by best practices for high efficiency from a SLM phase grating, we introduce an adaptive refractive algorithm which has high efficiency (92%) but also higher error (16%), for nearly cylindrically symmetric cases.

  1. Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Gao, Fan; Zhang, Dakuan; Wang, Jianyu; Sheng, Yun; Wang, Xinran; Chen, Kunji; Zhou, Minmin [Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China); Yan, Shancheng [Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China); School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing 210046 (China); Shen, Jiancang; Pan, Lijia; Shi, Yi, E-mail: yshi@nju.edu.cn [Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China); Collaborative Innovation Center of Advanced Micro-structures, Nanjing University, Nanjing 210093 (China)

    2015-01-26

    A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices.

  2. 21 CFR 868.5570 - Nonrebreathing mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask. (a) Identification. A nonrebreathing mask is a device fitting over a patient's face to administer oxygen. It utilizes...

  3. Pulsed Blue and Ultraviolet Laser System for Fluorescence Diagnostics based on Nonlinear Frequency Conversion

    DEFF Research Database (Denmark)

    Cheng, Haynes Pak Hay

    The motivation for the current thesis work is to build a compact, efficient, pulsed, diode-pumped solid-state (DPSS) laser at 340 nm to be used for autofluorescence imaging and related cancer diagnostic experiments. By exciting endogenous fluorophores in the UV spectrum, autofluorescence imaging...... ns. Comparing this to the 9 ns relative jitter achieved in the passive system shows the performance penalty incurred in using the passive approach. Lastly, practical applications of compact semiconductor and DPSS lasers in the blue and UV spectral region are presented. A CW tapered diode at 808 nm...... applied to other wavelengths; specifically, those in the blue and UV spectral region. Using the passive synchronization technique and the optimization procedure reported for quasi-three-level lasers, a new generation of high peak power, pulsed, blue and UV laser light sources could be realized....

  4. Proposed uv-FEL user facility at BNL

    International Nuclear Information System (INIS)

    Ben-Zvi, I.; Di Mauro, L.F.; Krinsky, S.; White, M.G.; Yu, L.H.; Batchelor, K.; Friedman, A.; Fisher, A.S.; Halama, H.; Ingold, G.; Johnson, E.D.; Kramer, S.; Rogers, J.T.; Solomon, L.; Wachtel, J.; Zhang, X.

    1991-01-01

    The NSLS at Brookhaven National Laboratory is proposing the construction of a UV-FEL operating in the wavelength range from visible to 750 Angstrom. Nano-Coulomb electron pulses will be generated at a laser photo-cathode RF gun at a repetition rate of 10 KHz. The 6 ps pulses will be accelerated to 250 MeV in a superconducting linac. The FEL output will serve four stations with independent wavelength tuning, using two wigglers and two rotating mirror beam switches. Seed radiation for the FEL amplifiers will be provided by conventional tunable lasers, and the final frequency multiplication from the visible or near UV to the VUV will be carried out in the FEL itself. Each FEL will comprise of an initial wiggler resonant to the seed wavelength, a dispersion section, and a second wiggler resonant to the output wavelength. The facility will provide pump probe capability, FEL or FEL, and FEL on synchrotron light from an insersion device on the NSLS X-Ray ring. 15 refs., 2 figs., 3 tabs

  5. 37 CFR 211.3 - Mask work fees.

    Science.gov (United States)

    2010-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2010-07-01 2010-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b) Section...

  6. Orientation tuning of contrast masking caused by motion streaks.

    Science.gov (United States)

    Apthorp, Deborah; Cass, John; Alais, David

    2010-08-01

    We investigated whether the oriented trails of blur left by fast-moving dots (i.e., "motion streaks") effectively mask grating targets. Using a classic overlay masking paradigm, we varied mask contrast and target orientation to reveal underlying tuning. Fast-moving Gaussian blob arrays elevated thresholds for detection of static gratings, both monoptically and dichoptically. Monoptic masking at high mask (i.e., streak) contrasts is tuned for orientation and exhibits a similar bandwidth to masking functions obtained with grating stimuli (∼30 degrees). Dichoptic masking fails to show reliable orientation-tuned masking, but dichoptic masks at very low contrast produce a narrowly tuned facilitation (∼17 degrees). For iso-oriented streak masks and grating targets, we also explored masking as a function of mask contrast. Interestingly, dichoptic masking shows a classic "dipper"-like TVC function, whereas monoptic masking shows no dip and a steeper "handle". There is a very strong unoriented component to the masking, which we attribute to transiently biased temporal frequency masking. Fourier analysis of "motion streak" images shows interesting differences between dichoptic and monoptic functions and the information in the stimulus. Our data add weight to the growing body of evidence that the oriented blur of motion streaks contributes to the processing of fast motion signals.

  7. 21 CFR 868.5590 - Scavenging mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food... DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification. A scavenging mask is a device positioned over a patient's nose to deliver anesthetic or analgesic gases to the...

  8. 21 CFR 868.5600 - Venturi mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is a...

  9. Enhancing Protein Disulfide Bond Cleavage by UV Excitation and Electron Capture Dissociation for Top-Down Mass Spectrometry.

    Science.gov (United States)

    Wongkongkathep, Piriya; Li, Huilin; Zhang, Xing; Loo, Rachel R Ogorzalek; Julian, Ryan R; Loo, Joseph A

    2015-11-15

    The application of ion pre-activation with 266 nm ultraviolet (UV) laser irradiation combined with electron capture dissociation (ECD) is demonstrated to enhance top-down mass spectrometry sequence coverage of disulfide bond containing proteins. UV-based activation can homolytically cleave a disulfide bond to yield two separated thiol radicals. Activated ECD experiments of insulin and ribonuclease A containing three and four disulfide bonds, respectively, were performed. UV-activation in combination with ECD allowed the three disulfide bonds of insulin to be cleaved and the overall sequence coverage to be increased. For the larger sized ribonuclease A with four disulfide bonds, irradiation from an infrared laser (10.6 µm) to disrupt non-covalent interactions was combined with UV-activation to facilitate the cleavage of up to three disulfide bonds. Preferences for disulfide bond cleavage are dependent on protein structure and sequence. Disulfide bonds can reform if the generated radicals remain in close proximity. By varying the time delay between the UV-activation and the ECD events, it was determined that disulfide bonds reform within 10-100 msec after their UV-homolytic cleavage.

  10. Laguerre-Gauss beam generation in IR and UV by subwavelength surface-relief gratings

    DEFF Research Database (Denmark)

    Vertchenko, Larissa; Shkondin, Evgeniy; Malureanu, Radu

    2017-01-01

    layerdepositions and dry etch techniques. We exploit the phenomenon of formbirefringence to give rise to the spin-to-orbital angular momentum conversion.We demonstrate that these plates can generate beams with high quality for theUV and IR range, allowing them to interact with high power laser sources orinside...... laser cavities....

  11. Laser-pulsed relativistic electron gun

    International Nuclear Information System (INIS)

    Sherman, N.K.

    1986-01-01

    A relativistic (β ≅ 0.8) electron gun with good emittance and subnanosecond pulse duration which can be synchronized to picosecond laser pulses is being developed at NRC for use in studies of particle acceleration by lasers. Bursts of electron pulses exceeding 280 keV in energy have been extracted into air form a laser-driven vacuum photodiode. Trains of 5 ps pulses of ultraviolet UV light illuminate a magnesium cathode. Photoelectrons emitted from the cathode are accelerated in a graded electrostatic potential set up by a 360 kV Marx-generator. The UV pulses are obtained by doubling the frequency of a 606 nm dye laser modelocked at 160 MHz. Electron energies were measured by residual range in an echelon of Al foils. Total charge per burst was measured by picoammeter. Time structure of the bursts has been examined with plastic scintillator and a fast photomultiplier. Tests on a low voltage photodiode achieved a current density of 180 A/cm/sup 2/ from an Mg cathode, with quantum efficiency of 2.4 x 10/sup -6/ electron per UV photon. The brevity and intensity of the laser pulses cause the electric charge collected per pulse to increase linearly with bias voltage rather than according to the Langmuir-Child law. Gun emittance is about 150 mm-msr and beam brightness is about 1A/cm/sup 2/-sr. Estimated duration of individual electron pulses of a burst is about 400 ps with instantaneous current of about 0.1 mA. Energy spread within one pulse is expected to be about 15%. This gun has the potential to be a useful source of relativistic electrons for laser acceleration studies

  12. Effects of laser uv-microirradiation (lambda=2573 A) on proliferation of Chinese hamster cells

    International Nuclear Information System (INIS)

    Cremer, C.; Cremer, T.; Zorn, C.; Schoeller, L.

    1976-01-01

    A laser uv-microbeam with a wavelength of 2573 A having a minimum spot diameter of approximately 0.5 μm was used to microirradiate interphase cells of a V-79 subline of Chinese hamster cells. The incident energy necessary to induce a significant decrease of proliferation was 30 to 60 times larger after microirradiation of cytoplasm as compared with microirradiation of nucleoplasm. The mean value of relative cell numbers 40 hr after irradiation as a function of incident energy did not differ whether the cells were microirradiated lying singly or together in small groups. Analysis of individual growth curves of singly lying cells microirradiated in the nucleoplasm with the same energy showed heterogeneous reactions. The incident energy per cell compatible with proliferation of about 50 percent of the cells after microirradiation of nucleoplasm was approximately 2 x 10 -3 ergs. From this value it is suggested that the energy density within the focus was in the region of several thousand ergs per square millimeter. Photochemical effects are thought to be the cause of growth disturbance, while thermal effects are excluded

  13. Structural colour printing from a reusable generic nanosubstrate masked for the target image

    International Nuclear Information System (INIS)

    Rezaei, M; Jiang, H; Kaminska, B

    2016-01-01

    Structural colour printing has advantages over traditional pigment-based colour printing. However, the high fabrication cost has hindered its applications in printing large-area images because each image requires patterning structural pixels in nanoscale resolution. In this work, we present a novel strategy to print structural colour images from a pixelated substrate which is called a nanosubstrate. The nanosubstrate is fabricated only once using nanofabrication tools and can be reused for printing a large quantity of structural colour images. It contains closely packed arrays of nanostructures from which red, green, blue and infrared structural pixels can be imprinted. To print a target colour image, the nanosubstrate is first covered with a mask layer to block all the structural pixels. The mask layer is subsequently patterned according to the target colour image to make apertures of controllable sizes on top of the wanted primary colour pixels. The masked nanosubstrate is then used as a stamp to imprint the colour image onto a separate substrate surface using nanoimprint lithography. Different visual colours are achieved by properly mixing the red, green and blue primary colours into appropriate ratios controlled by the aperture sizes on the patterned mask layer. Such a strategy significantly reduces the cost and complexity of printing a structural colour image from lengthy nanoscale patterning into high throughput micro-patterning and makes it possible to apply structural colour printing in personalized security features and data storage. In this paper, nanocone array grating pixels were used as the structural pixels and the nanosubstrate contains structures to imprint the nanocone arrays. Laser lithography was implemented to pattern the mask layer with submicron resolution. The optical properties of the nanocone array gratings are studied in detail. Multiple printed structural colour images with embedded covert information are demonstrated. (paper)

  14. Structural colour printing from a reusable generic nanosubstrate masked for the target image

    Science.gov (United States)

    Rezaei, M.; Jiang, H.; Kaminska, B.

    2016-02-01

    Structural colour printing has advantages over traditional pigment-based colour printing. However, the high fabrication cost has hindered its applications in printing large-area images because each image requires patterning structural pixels in nanoscale resolution. In this work, we present a novel strategy to print structural colour images from a pixelated substrate which is called a nanosubstrate. The nanosubstrate is fabricated only once using nanofabrication tools and can be reused for printing a large quantity of structural colour images. It contains closely packed arrays of nanostructures from which red, green, blue and infrared structural pixels can be imprinted. To print a target colour image, the nanosubstrate is first covered with a mask layer to block all the structural pixels. The mask layer is subsequently patterned according to the target colour image to make apertures of controllable sizes on top of the wanted primary colour pixels. The masked nanosubstrate is then used as a stamp to imprint the colour image onto a separate substrate surface using nanoimprint lithography. Different visual colours are achieved by properly mixing the red, green and blue primary colours into appropriate ratios controlled by the aperture sizes on the patterned mask layer. Such a strategy significantly reduces the cost and complexity of printing a structural colour image from lengthy nanoscale patterning into high throughput micro-patterning and makes it possible to apply structural colour printing in personalized security features and data storage. In this paper, nanocone array grating pixels were used as the structural pixels and the nanosubstrate contains structures to imprint the nanocone arrays. Laser lithography was implemented to pattern the mask layer with submicron resolution. The optical properties of the nanocone array gratings are studied in detail. Multiple printed structural colour images with embedded covert information are demonstrated.

  15. Nanostructure Secondary-Mirror Apodizing Mask for Transmitter Signal Suppression in a Duplex Telescope

    Science.gov (United States)

    Hagopian, John; Livas, Jeffrey; Shiri, Shahram; Getty, Stephanie; Tveekrem, June; Butler, James

    2012-01-01

    A document discusses a nanostructure apodizing mask, made of multi-walled carbon nanotubes, that is applied to the centers (or in and around the holes) of the secondary mirrors of telescopes that are used to interferometrically measure the strain of space-time in response to gravitational waves. The shape of this ultra-black mask can be adjusted to provide a smooth transition to the clear aperture of the secondary mirror to minimize diffracted light. Carbon nanotubes grown on silicon are a viable telescope mirror substrate, and can absorb significantly more light than other black treatments. The hemispherical reflectance of multi-walled carbon nanotubes grown at GSFC is approximately 3 to 10 times better than a standard aerospace paint used for stray light control. At the LISA (Laser Interferometer Space Antenna) wavelength of 1 micron, the advantage over paint is a factor of 10. Primarily, in the center of the secondary mirror (in the region of central obscuration, where no received light is lost) a black mask is applied to absorb transmitted light that could be reflected back into the receiver. In the LISA telescope, this is in the center couple of millimeters. The shape of this absorber is critical to suppress diffraction at the edge. By using the correct shape, the stray light can be reduced by approximately 10 to the 9 orders of magnitude versus no center mask. The effect of the nanotubes has been simulated in a stray-light model. The effect of the apodizing mask has been simulated in a near-field diffraction model. Specifications are geometry-dependent, but the baseline design for the LISA telescope has been modeled as well. The coatings are somewhat fragile, but work is continuing to enhance adhesion.

  16. Fast mask writers: technology options and considerations

    Science.gov (United States)

    Litt, Lloyd C.; Groves, Timothy; Hughes, Greg

    2011-04-01

    The semiconductor industry is under constant pressure to reduce production costs even as the complexity of technology increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which have added to the complexity of making masks because of the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low-k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that funding on the order of 50M to 90M for non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development poses a high risk for an individual supplier. The structure of the mask fabrication marketplace separates the mask writer equipment customer (the mask supplier) from the final customer (wafer manufacturer) that will be most effected by the increase in mask cost that will result if a high speed mask writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed.

  17. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device...

  18. Zirconia UV-curable colloids for additive manufacturing via hybrid inkjet printing-stereolithography

    DEFF Research Database (Denmark)

    Rosa, Massimo; Barou, C.; Esposito, Vincenzo

    2018-01-01

    Currently, additive manufacturing of ceramics by stereolithography (SLA) is limited to single materials and by a poor thickness resolution that strongly depends on the ceramic particles-UV light interaction. Combining selective laser curing with inkjet printing represents a novel strategy...... to overcome these constrains. Nonetheless, this approach requires UV-curable inks that allow hardening of the printed material and sintering to high density. In this work, we report how to design an ink for inkjet printing of yttria stabilized zirconia (YSZ) which can be impressed by addition of UV...

  19. Planar waveguide laser in Er/Al-doped germanosilicate

    DEFF Research Database (Denmark)

    Guldberg-Kjær, Søren Andreas; Hübner, Jörg; Kristensen, Martin

    1999-01-01

    A singlemode DBR laser is demonstrated in an Er/Al-doped germanosilicate planar waveguide. 0.4 mW of output power has been obtained at 1.553 mu m using internal Bragg reflectors produced by UV-induced index modulations.......A singlemode DBR laser is demonstrated in an Er/Al-doped germanosilicate planar waveguide. 0.4 mW of output power has been obtained at 1.553 mu m using internal Bragg reflectors produced by UV-induced index modulations....

  20. Simulation-based MDP verification for leading-edge masks

    Science.gov (United States)

    Su, Bo; Syrel, Oleg; Pomerantsev, Michael; Hagiwara, Kazuyuki; Pearman, Ryan; Pang, Leo; Fujimara, Aki

    2017-07-01

    For IC design starts below the 20nm technology node, the assist features on photomasks shrink well below 60nm and the printed patterns of those features on masks written by VSB eBeam writers start to show a large deviation from the mask designs. Traditional geometry-based fracturing starts to show large errors for those small features. As a result, other mask data preparation (MDP) methods have become available and adopted, such as rule-based Mask Process Correction (MPC), model-based MPC and eventually model-based MDP. The new MDP methods may place shot edges slightly differently from target to compensate for mask process effects, so that the final patterns on a mask are much closer to the design (which can be viewed as the ideal mask), especially for those assist features. Such an alteration generally produces better masks that are closer to the intended mask design. Traditional XOR-based MDP verification cannot detect problems caused by eBeam effects. Much like model-based OPC verification which became a necessity for OPC a decade ago, we see the same trend in MDP today. Simulation-based MDP verification solution requires a GPU-accelerated computational geometry engine with simulation capabilities. To have a meaningful simulation-based mask check, a good mask process model is needed. The TrueModel® system is a field tested physical mask model developed by D2S. The GPU-accelerated D2S Computational Design Platform (CDP) is used to run simulation-based mask check, as well as model-based MDP. In addition to simulation-based checks such as mask EPE or dose margin, geometry-based rules are also available to detect quality issues such as slivers or CD splits. Dose margin related hotspots can also be detected by setting a correct detection threshold. In this paper, we will demonstrate GPU-acceleration for geometry processing, and give examples of mask check results and performance data. GPU-acceleration is necessary to make simulation-based mask MDP verification

  1. Image registration for a UV-Visible dual-band imaging system

    Science.gov (United States)

    Chen, Tao; Yuan, Shuang; Li, Jianping; Xing, Sheng; Zhang, Honglong; Dong, Yuming; Chen, Liangpei; Liu, Peng; Jiao, Guohua

    2018-06-01

    The detection of corona discharge is an effective way for early fault diagnosis of power equipment. UV-Visible dual-band imaging can detect and locate corona discharge spot at all-weather condition. In this study, we introduce an image registration protocol for this dual-band imaging system. The protocol consists of UV image denoising and affine transformation model establishment. We report the algorithm details of UV image preprocessing, affine transformation model establishment and relevant experiments for verification of their feasibility. The denoising algorithm was based on a correlation operation between raw UV images, a continuous mask and the transformation model was established by using corner feature and a statistical method. Finally, an image fusion test was carried out to verify the accuracy of affine transformation model. It has proved the average position displacement error between corona discharge and equipment fault at different distances in a 2.5m-20 m range are 1.34 mm and 1.92 mm in the horizontal and vertical directions, respectively, which are precise enough for most industrial applications. The resultant protocol is not only expected to improve the efficiency and accuracy of such imaging system for locating corona discharge spot, but also supposed to provide a more generalized reference for the calibration of various dual-band imaging systems in practice.

  2. Additives in UV and ionising radiation grafting and curing processes

    International Nuclear Information System (INIS)

    Garnett, J.L.; Ng, L.T.; Viengkhou, V.

    1998-01-01

    Full text: Curing of polymers induced by both UV and ionising radiation are now established technologies. Currently both systems are predominantly based on acrylate chemistry. UV processes use photoinitiators to achieve fast polymerisation. In the proposed paper the significance of the occurrence of concurrent grafting with cure will be examined. particularly with respect to the recycling of finished product. Basic studies on grafting initiated by UV and ionising radiation will be discussed. Polar methyl methacrylate (MMA) and non-polar styrene will be used as representative monomers with cellulose and propylene typifying the backbone polymers. The additives chosen for examination in this study are predominantly components used in radiation curing formulations since grafting and curing are known to be mechanically related. The additives used were mineral acid, photoinitiators, vinyl ethers, oligomers, polyfunctional monomers including multifunctional acrylates (MFAs) and methacrylates (MFMAs). For the first time the use of charge transfer complexes in the Mulliken sense as additives in radiation grafting will be discussed. The CT complexes themselves, being monomers, have also been grafted to the above polymers. Recent developments with excimer laser sources for initiating these processes will be discussed, especially the use of non-acrylate chemistry. Excimer laser sources are shown to complement conventional UV and ionising radiation and are photoinitiator free. Mechanisms for the above grafting and curing processes will be outlined

  3. Laser-induced incandescence applied to dusty plasmas

    NARCIS (Netherlands)

    van de Wetering, F.M.J.H.; Oosterbeek, W.; Beckers, J.; Nijdam, S.; Kovacevic, E.; Berndt, J.

    2016-01-01

    This paper reports on the laser heating of nanoparticles (diameters ≤1 μm) confined in a reactive plasma by short (150 ps) and intense (~63 mJ) UV (355 nm) laser pulses (laser-induced incandescence, LII). Important parameters such as the particle temperature and radius follow from analysis of the

  4. Individuals and Their Masks

    Directory of Open Access Journals (Sweden)

    Belén Altuna

    2009-08-01

    Full Text Available This essay works on the opposition between face and mask, where ‘face’ is understood as that which makes every human being singular, and makes visible her or his unique worth, while ‘mask’ is understood as whatever hides that singularity, and refers to a category, stereotype or cliché. The etymological history that relates face and mask to the concept of person, and the history of modern portrait painting, which alternates representations of face and mask, both lead to a discussion with authors who diagnose a contemporary “defeat of the face” as a result of the crisis of humanism and of ethical individualism, which give meaning and dignity to that face.

  5. Image differencing using masked CCD

    International Nuclear Information System (INIS)

    Rushbrooke, J.G.; Ansorge, R.E.; Webber, C.J. St. J.

    1987-01-01

    A charge coupled device has some of its ''pixels'' masked by a material which is opaque to the radiation to which the device is to be exposed, each masked region being employed as a storage zone into which the charge pattern from the unmasked pixels can be transferred to enable a subsequent charge pattern to be established on further exposure of the unmasked pixels. The components of the resulting video signal corresponding to the respective charge patterns read-out from the CCD are subtracted to produce a video signal corresponding to the difference between the two images which formed the respective charge patterns. Alternate rows of pixels may be masked, or chequer-board pattern masking may be employed. In an X-ray imaging system the CCD is coupled to image intensifying and converting means. (author)

  6. Asbestos as 'toxic short-circuit' optic-fibre for UV within the cell-net: — Likely roles and hazards for secret UV and IR metabolism

    International Nuclear Information System (INIS)

    Traill, Robert R

    2011-01-01

    The most toxic asbestos fibres have widths 250nm-10nm, and this toxicity is 'physical', which could mean either mechanical or optical: Tangling with chromosomes is a mechanical hazard occasionally reported, and fibres 100nm wide — or chrysotile (white asbestos) is >150nm. In both cases, UV A /UV B -transmission would then predominate. (Chrysotile 150nm might be benign — escaping both mechanical and optical!). But what would generate such UV, and why would its transmission be toxic? Thar and Kühl (J.Theor.Biol.:2004) explain that the long mitochondria on microtubules may be able to act as UV-lasers, (and many observers since Gurwitsch 1923 have reported ultraweak UV emissions escaping from all types of living bio-tissue). That all suggests some universal secret role for UV, apparently related to mitosis. Insertion of fibre 'short-circuits' could then cause upsets in mitosis-control, and hence DNA irregularities. Such UV-control could parallel similar lower-powered Infra-Red control-systems (as considered elsewhere for coaxial myelin; or as portrayed by G.Albrecht-Buehler's online animations etc.); and the traditional short mitochondria seem better suited for this IR task.

  7. Evaluation of a new pediatric positive airway pressure mask.

    Science.gov (United States)

    Kushida, Clete A; Halbower, Ann C; Kryger, Meir H; Pelayo, Rafael; Assalone, Valerie; Cardell, Chia-Yu; Huston, Stephanie; Willes, Leslee; Wimms, Alison J; Mendoza, June

    2014-09-15

    The choice and variety of pediatric masks for continuous positive airway pressure (CPAP) is limited in the US. Therefore, clinicians often prescribe modified adult masks. Until recently a mask for children aged mask for children aged 2-7 years (Pixi; ResMed Ltd, Sydney, Australia). Patients aged 2-7 years were enrolled and underwent in-lab baseline polysomnography (PSG) using their previous mask, then used their previous mask and the VPAP III ST-A flow generator for ≥ 10 nights at home. Thereafter, patients switched to the Pixi mask for ≥ 2 nights before returning for a PSG during PAP therapy via the Pixi mask. Patients then used the Pixi mask at home for ≥ 21 nights. Patients and their parents/guardians returned to the clinic for follow-up and provided feedback on the Pixi mask versus their previous mask. AHI with the Pixi mask was 1.1 ± 1.5/h vs 2.6 ± 5.4/h with the previous mask (p = 0.3538). Parents rated the Pixi mask positively for: restfulness of the child's sleep, trouble in getting the child to sleep, and trouble in having the child stay asleep. The Pixi mask was also rated highly for leaving fewer or no marks on the upper lip and under the child's ears, and being easy to remove. The Pixi mask is suitable for children aged 2-7 years and provides an alternative to other masks available for PAP therapy in this age group. © 2014 American Academy of Sleep Medicine.

  8. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show...... that the proposed method is able to minimize the target speech distortion while suppressing the crosstalk to a predetermined threshold. It is observed that compared to the STFTbased masks, the proposed sinusoidal masks improve the separation performance in terms of objective measures (SSNR and PESQ) and are mostly...

  9. Predicting masking release of lateralized speech

    DEFF Research Database (Denmark)

    Chabot-Leclerc, Alexandre; MacDonald, Ewen; Dau, Torsten

    2016-01-01

    . The largest masking release (MR) was observed when all maskers were on the opposite side of the target. The data in the conditions containing only energetic masking and modulation masking could be accounted for using a binaural extension of the speech-based envelope power spectrum model [sEPSM; Jørgensen et...... al., 2013, J. Acoust. Soc. Am. 130], which uses a short-term equalization-cancellation process to model binaural unmasking. In the conditions where informational masking (IM) was involved, the predicted SRTs were lower than the measured values because the model is blind to confusions experienced...

  10. Choice of Eye-Safe Radiation Wavelength in UV and Near IR Spectral Bands for Remote Sensing

    Directory of Open Access Journals (Sweden)

    M. L. Belov

    2016-01-01

    Full Text Available The introduction of laser remote sensing systems carries a particular risk to the human’s sense of vision. A structure of the eye, and especially the retina, is the main critical organ as related to the laser radiation.The work uses the optical models of the atmosphere, correctly working in both the UV and the near-IR band, to select the eye-safe radiation wavelengths in the UV (0.355 m and near-IR (~ 1.54 and ~ 2 m spectral bands from the point of view of recorded lidar signal value to fulfill the tasks of laser sensing the natural formations and laser aerosol sensing in the atmosphere.It is shown that the remote sensing lasers with appropriate characteristics can be selected both in the UV band (at a wavelength of 0.355 μm and in the near-IR band (at wavelengths of 1.54 ~ or ~ 2 μm.Molecular scattering has its maximum (for the selected wavelength at a wavelength of 0.355 μm in the UV band, and the minimum at the wavelengths of 1.54 and 2.09 μm in the near -IR band. The main contribution to the molecular absorption at a wavelength of 0.355 μm is made by ozone. In the near-IR spectral band the radiation is absorbed due to water vapor and carbon dioxide.Calculations show that the total effect of the molecular absorption and scattering has no influence on radiation transmission for both the wavelength of 0.355 μm in the UV band, and the wavelengths of 1.54 and 2.09 μm in the near-IR band for sensing trails ~ 1 km.One of the main factors of laser radiation attenuation in the Earth's atmosphere is radiation scattering by aerosol particles.The results of calculations at wavelengths of 0.355 μm, 1.54 μm and 2.09 μm for the several models of the atmosphere show that a choice of the most effective (in terms of the recorded signal of lidar and eye-safe radiation wavelength depends strongly on the task of sensing.To fulfill the task of laser sensing the natural formations, among the eye-safe wavelengths there is one significantly advantageous

  11. Lensless digital holography with diffuse illumination through a pseudo-random phase mask.

    Science.gov (United States)

    Bernet, Stefan; Harm, Walter; Jesacher, Alexander; Ritsch-Marte, Monika

    2011-12-05

    Microscopic imaging with a setup consisting of a pseudo-random phase mask, and an open CMOS camera, without an imaging objective, is demonstrated. The pseudo random phase mask acts as a diffuser for an incoming laser beam, scattering a speckle pattern to a CMOS chip, which is recorded once as a reference. A sample which is afterwards inserted somewhere in the optical beam path changes the speckle pattern. A single (non-iterative) image processing step, comparing the modified speckle pattern with the previously recorded one, generates a sharp image of the sample. After a first calibration the method works in real-time and allows quantitative imaging of complex (amplitude and phase) samples in an extended three-dimensional volume. Since no lenses are used, the method is free from lens abberations. Compared to standard inline holography the diffuse sample illumination improves the axial sectioning capability by increasing the effective numerical aperture in the illumination path, and it suppresses the undesired so-called twin images. For demonstration, a high resolution spatial light modulator (SLM) is programmed to act as the pseudo-random phase mask. We show experimental results, imaging microscopic biological samples, e.g. insects, within an extended volume at a distance of 15 cm with a transverse and longitudinal resolution of about 60 μm and 400 μm, respectively.

  12. Laser Meter of Atmospheric Inhomogeneity Properties in UV Spectral Range

    Directory of Open Access Journals (Sweden)

    S. E. Ivanov

    2015-01-01

    Full Text Available Development of laser systems designed to operate in conditions of the terrestrial atmosphere demands reliable information about the atmosphere condition. The aerosol lidars for operational monitoring of the atmosphere allow us to define remotely characteristics of atmospheric aerosol and cloudy formations in the atmosphere.Today the majority of aerosol lidars run in the visible range. However, in terms of safety (first of all to eyes also ultra-violet (UF range is of interest. A range of the wavelengths of the harmful effect on the eye retina is from 0.38 to 1.4 mμ. Laser radiation with the wavelengths less than 0.38 mμ and over 1.4 mμ influences the anterior ambient of an eye and is safer, than laser radiation with the wavelengths of 0.38 – 1.4 mμ.The paper describes a laser meter to measure characteristics of atmospheric inhomogeneity propertis in UF spectral range at the wavelength of 0.355 mμ.As a radiation source, the meter uses a semiconductor-pumped pulse solid-state Nd:YAG laser. As a receiving lens, Kassegren's scheme-implemented mirror lens with a socket to connect optical fibre is used in the laser meter. Radiation from the receiving lens is transported through the optical fibre to the optical block. The optical block provides spectral selection of useful signal and conversion of optical radiation into electric signal.To ensure a possibility for alignment of the optical axes of receiving lens and laser radiator the lens is set on the alignment platform that enables changing lens inclination and turn with respect to the laser.The software of the laser meter model is developed in the NI LabVIEW 2012 graphic programming environment.The paper gives the following examples: a typical laser echo signal, which is back scattered by the atmosphere and spatiotemporal distribution of variation coefficient of the volumetric factor of the back scattered atmosphere. Results of multi-day measurements show that an extent of the recorded aerosol

  13. UV-VUV FEL program at DUKE storage ring with OK-4 optical klystron

    International Nuclear Information System (INIS)

    Litvinenko, V.N.; Madey, J.M.J.; Vinokurov, N.A.

    1993-01-01

    A 1 GeV electron storage ring dedicated for UV-VUV FEL operation is under construction at the Duke University Free Electron Laser Laboratory. The UV-VUV-FEL project, based on the collaboration of the Duke FEL Laboratory and Budker Institute for Nuclear Physics is described. The main parameters of the DFELL storage ring, of the OK-4 optical klystron, and the experimental set-up are presented. The parameters of UV-VUV FEL are given and the possible future upgrades to this system are discussed

  14. Ablation of polymers by ultraviolet pulsed laser

    International Nuclear Information System (INIS)

    Brezini, A.; Benharrats, N.

    1993-08-01

    The surface modifications of different polymers treated by far UV-Excimer laser (λ = 193mn, 248, 308nm) are analysed by X-Ray Photoelectrons Spectroscopy. The main feature observed depends strongly on the absorption coefficients. For the high absorbing polymers such (PVC, PS, PI,...) the mechanism of the UV-Excimer Laser interaction appears to be governed by an ablative photodecomposition process (APD) with an APD threshold. In the other limit, i.e. low absorbing polymer the interaction leads to a photothermal process. (author). 51 refs, 24 figs, 7 tabs

  15. Rapid iconic erasure without masking.

    Science.gov (United States)

    Tijus, Charles Albert; Reeves, Adam

    2004-01-01

    We report on the erasure of the iconic memory of an array of 12 black letters flashed on a continuously- present white field. Erasure is accomplished by replacing the 16 ms letter array (frame 1) with a blank white frame for 16 ms (frame 2). The letter array returns in frame 3, with from one to six letters missing. Report of the missing letters is accurate without the blank white frame but is impoverished with it, as if interposing the blank erases the icon. Erasure occurs without any obvious luminance masking, 'mud splashes', pattern masking (backward, forward, or metacontrast), lateral masking, or masking by object substitution. Erasure is greatly decreased if the blank is presented one frame earlier or later. We speculate that erasure is due to a rapid reset of the icon produced by an informational mis-match.

  16. Surface plasmon-enhanced two-photon excited whispering-gallery modes ultraviolet laser from Zno microwire

    Directory of Open Access Journals (Sweden)

    Yunpeng Wang

    2017-11-01

    Full Text Available The two-photon excited UV laser with narrow line width and high Q value was obtained. The total internal reflection from the four side surfaces of the quadrilateral-ZnO microwire offered the whispering gallery mode (WGM resonant cavity. The UV emission, resonant mechanism, and laser mode characteristics were discussed in detail for this special type of micro-cavity. In addition, in order to enhance the power of the two-photon excited UV laser, the surface plasmon enhancement by the Au nanoparticles was also performed and explained well by the theory of the localized surface plasmon.

  17. Near-UV laser treatment of extrinsic dental enamel stains.

    Science.gov (United States)

    Schoenly, J E; Seka, W; Featherstone, J D B; Rechmann, P

    2012-04-01

    The selective ablation of extrinsic dental enamel stains using a 400-nm laser is evaluated at several fluences for completely removing stains with minimal damage to the underlying enamel. A frequency-doubled Ti:sapphire laser (400-nm wavelength, 60-nanosecond pulse duration, 10-Hz repetition rate) was used to treat 10 extracted human teeth with extrinsic enamel staining. Each tooth was irradiated perpendicular to the surface in a back-and-forth motion over a 1-mm length using an ∼300-µm-diam 10th-order super-Gaussian beam with fluences ranging from 0.8 to 6.4 J/cm(2) . Laser triangulation determined stain depth and volume removed by measuring 3D surface images before and after irradiation. Scanning electron microscopy evaluated the surface roughness of enamel following stain removal. Fluorescence spectroscopy measured spectra of unbleached and photobleached stains in the spectral range of 600-800 nm. Extrinsic enamel stains are removed with laser fluences between 0.8 and 6.4 J/cm(2) . Stains removed on sound enamel leave behind a smooth enamel surface. Stain removal in areas with signs of earlier cariogenic acid attacks resulted in isolated and randomly located laser-induced, 50-µm-diam enamel pits. These pits contain 0.5-µm diam, smooth craters indicative of heat transfer from the stain to the enamel and subsequent melting and water droplet ejection. Ablation stalling of enamel stains is typically observed at low fluences (Laser ablation of extrinsic enamel stains at 400 nm is observed to be most efficient above 3 J/cm(2) with minimal damage to the underlying enamel. Unsound underlying enamel is also observed to be selectively removed after irradiation. Copyright © 2012 Wiley Periodicals, Inc.

  18. Effect of laser on human blood

    International Nuclear Information System (INIS)

    Abdalsamad, Amuna Nagash Mohammed

    2016-03-01

    In this work, the effect of He-Ne (632.8 nm), N2 (337.1 nm), LED (450 nm) on the human blood, and blood component was studied by using CBC machine ( complete blood count) and UV -visible spectroscopy. Blood samples platoon A+ were collected and irradiated for different periods of time (10 minute, 20 minute, and 30 minute), to varied types of light source ( He- Ne laser and LED). Blood parameters of samples were measured by using complete Blood Count Machine (CBC). The absorption spectrum of blood samples were examined by using UV-visible spectrometer. The obtained results have shown different values of Complete Blood Counts and absorption spectrum due to different laser types and periods of time. We conclude that the laser light has clear effect on blood samples. (Author)

  19. Choice of Eye-Safe Radiation Wavelength in UV and Near IR Spectral Bands for Remote Sensing

    OpenAIRE

    M. L. Belov; V. A. Gorodnichev; D. A. Kravtsov; A. A. Cherpakova

    2016-01-01

    The introduction of laser remote sensing systems carries a particular risk to the human’s sense of vision. A structure of the eye, and especially the retina, is the main critical organ as related to the laser radiation.The work uses the optical models of the atmosphere, correctly working in both the UV and the near-IR band, to select the eye-safe radiation wavelengths in the UV (0.355 m) and near-IR (~ 1.54 and ~ 2 m) spectral bands from the point of view of recorded lidar signal value to ful...

  20. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like