WorldWideScience

Sample records for masked uv laser

  1. Imaging micro-well proportional counters fabricated with masked UV laser ablation

    CERN Document Server

    Deines-Jones, P; Crawford, H; Hunter, S D

    2002-01-01

    The micro-well detector is a gas-proportional counter similar to the CAT (Bartol et al., J. Phys. III 6 (1996) 337) and WELL detectors (Bellazzini et al., Nucl. Instr. and Meth. A 423 (1999) 125). The micro-well is a cylindrical hole formed in the polymer substrate of commercially fabricated copper-clad flexible printed circuit board by UV laser ablation. The micro-wells are drilled at GSFC's UV laser-ablation facility. The cathode is a metal annulus that surrounds the opening of the well. The anode is a metal pad that fills the bottom of the well. Advantages of this topology include intrinsic two-dimensional sensing, thick robust electrodes, and large localized image charge on the cathodes. We have fabricated 5 cmx5 cm micro-well detectors with segmented anodes (1-d) and with both anodes and cathodes segmented (2-d), and have demonstrated: - stable, proportional operation at gas gains in excess of 30,000 in Ar- and Xe-based gases; - FWHM energy resolution of 20% at 6 keV in P-10; - preliminary 1-d spatial re...

  2. A prototype erodible mask delivery system for the excimer laser.

    Science.gov (United States)

    Maloney, R K; Friedman, M; Harmon, T; Hayward, M; Hagen, K; Gailitis, R P; Waring, G O

    1993-04-01

    The authors developed an erodible mask delivery system for the argon-fluoride 193-nm excimer laser, which offers the possibility of correcting hyperopia and astigmatism as well as myopia. Masks were made of polymethylmethacrylate on a quartz window, with intended corrections for myopia and hyperopia of 2.5 and 5 diopters (D). Ablations using the mask and control ablations using an expanding diaphragm were performed in 30 eyes of 15 pigmented rabbits with an Excimed UV200 laser (Summit Technology, Inc, Waltham, MA). The rabbits were followed for 134 days with regular biomicroscopy and retinoscopic examination by two observers. Ablations with the mask to correct myopia were successful and produced stable corrections, although the higher-power mask produced undercorrections. Hyperopic masks produced paradoxic myopic corrections, possibly due to the lack of a transition zone at the edge of the mask. Corneas ablated with the mask had less sub-epithelial haze than those ablated with the diaphragm at all examinations. Results of histopathologic examination showed epithelial hyperplasia over the ablation zone in all eyes. Dichlorotriazinyl aminofluorescein collagen staining showed subepithelial new collagen in all eyes, but there was no relation between the depth of ablation at any point on the cornea and the amount of new collagen deposited there. Myopic ablations are feasible with the erodible mask, although additional calibration is needed. Hyperopic ablations were unsuccessful with the current design. Corneas ablated with the mask may be clearer than corneas ablated with the diaphragm, possibly due to a smoother ablated surface. Regression of effect after laser ablation in the rabbit model is likely due more to epithelial hyperplasia than to stromal remodeling.

  3. UV-NIL mask making and imprint evaluation

    Science.gov (United States)

    Fujii, Akiko; Sakai, Yuko; Mizuochi, Jun; Hiraka, Takaaki; Yusa, Satoshi; Kuriyama, Koki; Sakaki, Masashi; Sutou, Takanori; Sasaki, Shiho; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

    2008-05-01

    UV NIL shows excellent resolution capability with remarkable low line edge roughness, and has been attracting pioneers in the industry who were searching for the finest patterns. We have been focused on the resolution improvement in mask making, and with a 100kV acceleration voltage EB writer process, we have achieved down to 18nm resolution, and have established a mask making process to meet the requirements of the pioneers. Usually such masks needed just a small field (several hundred microns square or so). Now, UV NIL exploration seems to have reached the step of feasibility study for mass production. Here, instead of a small field, a full chip field mask is required, though the resolution demand is not as tough as for the extremely advanced usage. The 100kV EB writers are adopting spot beams to generate the pattern and have a fatally low throughput if we need full chip writing. In this work, we focused on the 50keV variable shaped beam (VSB) EB writers, which are used in current 4X photomask manufacturing. The 50kV VSB writers can generate full chip pattern in a reasonable time, and by choosing the right patterning material and process, we could achieve resolution down to 32nm. Our initial results of 32nm class NIL masks with full chip field size will be shown and resolution improvement plan to further technology nodes will be discussed.

  4. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    Science.gov (United States)

    Fan, Yiqiang; Li, Huawei; Yi, Ying; Foulds, Ian G.

    2013-10-01

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.

  5. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    KAUST Repository

    Fan, Yiqiang

    2013-12-16

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.

  6. Energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1996-01-01

    A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may...

  7. Phase shifting mask modulated laser patterning on graphene

    Science.gov (United States)

    Gao, Fan; Liu, Fengyuan; Ye, Ziran; Sui, Chenghua; Yan, Bo; Cai, Pinggen; Lv, Bin; Li, Yun; Chen, Naibo; Zheng, Youdou; Shi, Yi

    2017-01-01

    A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.

  8. UV Laser Ablation of Electronically Conductive Polymers

    Science.gov (United States)

    1992-06-16

    deionized water. The polymerization solution for polyaniline was prepared by mixing equal volumes of a solution that was 0.25 M in ammonium persulfate with a...rum2,0 vvcsL) TbeUV.layer ablation of thin polypyrrole and polyaniline films coated on an insulating substrate is described. UV laser ablation is used to...11liiii929. 6 1 2:- A ABSTRACT The UV laser ablation of thin polypyrrole and polyaniline films coated on an insulating substrate is described. UV laser

  9. Compact excimer laser light source for optical (mask) inspection systems

    Science.gov (United States)

    Pflanz, Tobias; Huber, Heinz

    2001-04-01

    The discharge pumped excimer laser is a gas laser providing ultra violet radiation with well defined spectral, temporal and spatial properties. The fast development of excimer lasers in recent years has succeeded in designing very compact, turn-key systems delivering up to 10 W of radiation at 248 nm (5 W at 193 nm and 1 W at 157 nm) with repetition rates up to 1000 Hz. Experimental data on important beam properties of excimer lasers in the field of mask inspection are being presented and discussed. Relevant parameters are spectral bandwidth, energetic pulse-to-pulse stability, pulse duration, beam pointing stability, beam direction stability, beam dimension, beam profile and coherence. We will compare the excimer laser with lamp sources and continuous wave lasers in the framework of these parameters. The discussion will show future opportunities of compact excimer lasers in optical inspection as well as in mask writing systems, improving resolution and throughput.

  10. High Efficiency Mask Based Laser Materials Processing with TEA-CO2 - and Excimer Laser

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general, mask based laser materials processing techniques suffer from a very low energy efficiency. We have developed a simple device called an energy enhancer, which is capable of increasing the energy efficiency of typical mask based laser materials processing systems. A short review...... line marking with TEA-CO2 laser of high speed canning lines. The second one is manufactured for marking or microdrilling with excimer laser....

  11. Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

    KAUST Repository

    Fan, Yiqiang

    2012-01-13

    This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct printing of the mask onto a polymer sheet using a commercial wax printer. The wax layer was then transferred to a PMMA substrate using a thermal laminator, exposed using deep-UV (with a wavelength of 254 nm), developed in an IPA:water solution, and completed by bonding on a PMMA cap layer. A sample microfluidic device fabricated with this method is also presented, with the microchannel as narrow as 50 μm. The whole process is easy to perform without the requirement for any microfabrication facilities. © 2012 IOP Publishing Ltd.

  12. Recent developments in UV laser micromachining

    Science.gov (United States)

    Delmdahl, R.; Pätzel, Rainer

    2008-02-01

    Stable, high energy excimer lasers providing pulsed output energies ranging from 100 mJ up to over 1000 mJ in the ultraviolet region with photon energies as high as 5 eV (248 nm), 6.3 eV (193 nm) or 7.9 eV (157 nm) lend maximum flexibility to laser microprocessing, since virtually every material is amenable to accurate, high resolution material ablation without subsequent cleaning. Due to the UV photons provided with no up-conversion required as direct output by excimer lasers, output powers of many hundred watts are easily achievable and are key to high throughput, and up-scaling capability of manufacturing processes. Most important for reproducible production results is a temporally and spatially stable behavior of consecutive laser pulses as well as utmost lateral homogeneity of the on-sample energy density (fluence). These requirements constitute the superiority of excimer lasers over other pulsed UV laser sources such as lamp-pumped Nd:YAG lasers. Pulse-to-pulse stabilities of less than 1 %, rms as easily provided by excimer laser systems which cannot be achieved with frequency converted Nd:YAG. Laser systems. In particular, the large flat-top excimer laser profile is well-suited for most efficient parallel processing of two and three dimensional microstructures. Spectral properties, temporal pulse and laser beam parameters of state of the art UV excimer lasers and beam delivery systems will be compared with frequency converted, flash-lamp pumped Nd:YAG lasers.

  13. UV laser ablation patterns in intraocular lenses

    Science.gov (United States)

    Lagiou, D. P.; Evangelatos, Ch.; Apostolopoulos, A.; Spyratou, E.; Bacharis, C.; Makropoulou, M.; Serafetinides, A. A.

    2013-03-01

    The aim of this work is to investigate the effect of UV solid state laser radiation on intraocular lens (IOL) polymer surfaces as an alternative method to conventional surface shaping techniques for IOLs customization. Laser ablation experiments were performed on PMMA plates and commercially available hydrophobic and hydrophilic acrylic IOLs with the 5th harmonic of a Q-switched Nd:YAG laser (λ=213 nm). Circular arrays of holes were drilled on the polymer surface, covering the centre and the peripheries of the IOL. The morphology of the ablated IOL surface was examined with a conventional optical microscope (Leitz GMBH Wetzlar) and with a scanning electron microscope (SEM, Fei - Innova Nanoscope) at various laser parameters. Quantitative measurements of ablation rates were performed with a contact profilometer (Dektak-150), in which a mechanical stylus scanned across the surface of gold-coated IOLs (after SEM imaging) to measure variationsF in surface height. Laser interaction with IOLs depends on optical and mechanical material properties, in addition to laser radiation parameters. The exact ablation mechanism is discussed. Some polymer materials, depending on their properties, are more susceptible to the photothermal mechanism than the photochemical one or vice versa. In summary, every IOL polymer exhibits specific attributes in its interaction with the 5th harmonic of Nd:YAG laser.

  14. Pulsed UV laser technologies for ophthalmic surgery

    Science.gov (United States)

    Razhev, A. M.; Chernykh, V. V.; Bagayev, S. N.; Churkin, D. S.; Kargapol’tsev, E. S.; Iskakov, I. A.; Ermakova, O. V.

    2017-01-01

    The paper provides an overview of the results of multiyear joint researches of team of collaborators of Institute of Laser Physics SB RAS together with NF IRTC “Eye Microsurgery” for the period from 1988 to the present, in which were first proposed and experimentally realized laser medical technologies for correction of refractive errors of known today as LASIK, the treatment of ophthalmic herpes and open-angle glaucoma. It is proposed to carry out operations for the correction of refractive errors the use of UV excimer KrCl laser with a wavelength of 222 nm. The same laser emission is the most suitable for the treatment of ophthalmic herpes, because it has a high clinical effect, combined with many years of absence of recrudescence. A minimally invasive technique of glaucoma operations using excimer XeCl laser (λ=308 nm) is developed. Its wavelength allows perform all stages of glaucoma operations, while the laser head itself has high stability and lifetime, will significantly reduce operating costs, compared with other types of lasers.

  15. Electrically Injected UV-Visible Nanowire Lasers

    Energy Technology Data Exchange (ETDEWEB)

    Wang, George T.; Li, Changyi; Li, Qiming; Liu, Sheng; Wright, Jeremy Benjamin; Brener, Igal; Luk, Ting -Shan; Chow, Weng W.; Leung, Benjamin; Figiel, Jeffrey J.; Koleske, Daniel D.; Lu, Tzu-Ming

    2015-09-01

    There is strong interest in minimizing the volume of lasers to enable ultracompact, low-power, coherent light sources. Nanowires represent an ideal candidate for such nanolasers as stand-alone optical cavities and gain media, and optically pumped nanowire lasing has been demonstrated in several semiconductor systems. Electrically injected nanowire lasers are needed to realize actual working devices but have been elusive due to limitations of current methods to address the requirement for nanowire device heterostructures with high material quality, controlled doping and geometry, low optical loss, and efficient carrier injection. In this project we proposed to demonstrate electrically injected single nanowire lasers emitting in the important UV to visible wavelengths. Our approach to simultaneously address these challenges is based on high quality III-nitride nanowire device heterostructures with precisely controlled geometries and strong gain and mode confinement to minimize lasing thresholds, enabled by a unique top-down nanowire fabrication technique.

  16. Prototype of an energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general mask based laser material processing (MBLMP) is a process which suffers from a low energy efficiency, because the majority of the laser light is absorbed in or reflected by the mask. We have developed a device called an energy enhancer which is capable of improving the energy efficiency...

  17. Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

    DEFF Research Database (Denmark)

    Berini, Abadal Gabriel; Boisen, Anja; Davis, Zachary James;

    1999-01-01

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromecha......A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production...

  18. Amplification of Short Pulse High Power UV Laser

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    At recent year, with the development of CPA and other amplification technology, laser intensity achieves great increase and laser power can be high to PW(105) now, this ultrashort pulse lasers offer scientists a route to investigate laser-matter interaction in an absolute new regime.So far the researches on ultrashort pulse laser-matter interaction concentrated on infrared regime, yet ultraviolet laser has the advantage in intense field physics and ICF researches for its short wavelength and less nonlinear effects. KrF excimer is the best medium in UV ultrashort pulse amplification for its small saturation energy and high contrast ratio accessible.

  19. Laser trepanning of CFRP with a scanner head for IR and UV lasers

    Science.gov (United States)

    Anzai, Kenji; Aoyama, Mitsuaki; Fujisaki, Akira; Miyato, Taizo; Kayahara, Takashi; Harada, Yoshihisa; Niino, Hiroyuki

    2014-03-01

    The dual beam of cw-350 W single-mode near-IR fiber laser and ns-pulsed-35 W UV laser were used in the experiments for cutting. The laser beam on the sample surface was scanned with a galvanometer scanner and focused with the f-theta lens of 400 mm focal length for IR and UV laser irradiations. A prototype remote scanner head for the multiple laser irradiations has been developed for a high-quality and high-speed laser processing of carbon fiber reinforced plastics (CFRP). In this paper, we report on the laser trepanning of circular patterns on CFRP.

  20. UV-laser crosslinking of proteins to DNA.

    Science.gov (United States)

    Moss, T; Dimitrov, S I; Houde, D

    1997-02-01

    Photochemical crosslinking is now a powerful method for studying protein-nucleic acid interactions. UV light is a zero-length crosslinking agent that predominantly or exclusively crosslinks proteins to nucleic acids at their contact points. It can therefore provide strong evidence for close protein-nucleic acid interactions. However, to achieve an acceptable degree of crosslinking with conventional UV light sources, exposure times ranging from minutes to several hours are necessary. Such prolonged irradiation allows for the artifactual redistribution of proteins and precludes kinetic studies. The use of UV lasers overcomes these difficulties since the number of photons required for the crosslinking may be delivered in time intervals on the order of nano- or even picoseconds. We described detailed procedures for UV laser-induced protein-DNA crosslinking both in vivo and in vitro. Technical aspects, including the choice of UV laser for irradiation, the isolation of covalently crosslinked protein-DNA complexes, immunochemical techniques for both the identification and isolation of specific protein-DNA complexes and the identification of the crosslinked DNA sequences, are reviewed in detail. The application of UV laser crosslinking in kinetic studies is illustrated by the example of the TATA-binding protein (TBP) interaction with the adenovirus E4 promoter.

  1. BDS Thin Film UV Antireflection Laser Damage Competition

    Energy Technology Data Exchange (ETDEWEB)

    Stolz, C J

    2010-10-26

    UV antireflection coatings are a challenging coating for high power laser applications as exemplified by the use of uncoated Brewster's windows in laser cavities. In order to understand the current laser resistance of UV AR coatings in the industrial and university sectors, a double blind laser damage competition was performed. The coatings have a maximum reflectance of 0.5% at 355 nm at normal incidence. Damage testing will be performed using the raster scan method with a 7.5 ns pulse length on a single testing facility to facilitate direct comparisons. In addition to the laser resistance results, details of deposition processes and coating materials will also be shared.

  2. Short Pulse UV-Visible Waveguide Laser.

    Science.gov (United States)

    1980-07-01

    millimeters of the capillary tube ends. 7 A perimetric study of the laser operation was conducted in which the gas pressure, gas mixture, applied voltage, gas...removal rate through an increase in the V-T vibrational relaxation rate. When the dye laser was adjusted to the red side of the blue transition

  3. Characterization of LIL laser UV focal spot

    Energy Technology Data Exchange (ETDEWEB)

    Mangeant, M.; Dubois, J.L.; Behar, G.; Arroyo, P.; Durand, V.; Lahonde, C. [CEA - Centre d' Etudes Scientifiques et Techniques d' Aquitaine, CESTA/DLP, 33 - Le Barp (France)

    2006-06-15

    One way to get the fusion of hydrogen in laboratory consists in heating and compressing a DT fuel capsule by using a laser. To reach this aim requires a new generation of high power laser facility. Cea (French board for atomic energy) is developing for this purpose a new 240 laser line facility, the LMJ facility. The LIL which is the prototype of four LMJ laser lines is operational now. In order to confirm the technical choices, a systematic characterization of LIL was carried out. A particular effort has been provided to measure the 3{omega} high energy focal spot (1.5 kJ/700 ps and 5 ns for one beam) and the synchronization of laser beams onto the target, which are key issues for the plasma production. An experimental device, SAT-3{omega} (a 3{omega} laser focal spot analysis) has been designed to perform these measures. That diagnostic which is located at the end of the laser lines delivered its first results during the 2004 quadruplet qualification campaigns. The near field imaging showed no diaphony and vignetting. Low power spots allowed us to control we had no ghost. The energy measurement quality showed the photometric transfer function was perfectly known. Our caustic image are given with an average dynamic range of 800, a spatial resolution of 10 {mu}m and diameter accuracy about 1% for 50% and 3% for 90% of encircled energy. The high energy focal spot diameters are in agreement with low and very low energy diameters. The phase plate and 14 GHz effects are similar to what we had expected. For a laser shot completed with a continuous phase plate at 14 GHz, and for an energy level of 1.5 kJ per beam at 351 nm, the focal beam diameter at 3% of the peak level is (875 {+-} 45) {mu}m.

  4. UV Laser Fluorosensor for Remote Sensing

    Directory of Open Access Journals (Sweden)

    V. N. Saxena

    1988-07-01

    Full Text Available Several substances both organic and inorganic, when excited by alow wavelength radiation, fluoresce; the fluorescence in the longer wavelength region is generally characteristic of the substances so irradiated and to some extent of the wavelength of the exciting radiation. Thus, the spectral analysis of this fluorescence can be used to detect, monitor and even quantify the presence of matter on which the exciting radiations impinge. The rate of decay of the fluorescence alongwith a spectral and temporal return signals, such as from oil spills, have been described in this paper as also the functioning of an airborne laser fluorosensor using a 1 MW pulsed nitiogcn laser.

  5. UV Laser-Induced DNA Photochemistry

    Science.gov (United States)

    1991-05-13

    nicking of DNA) can be described by a Poisson distribution (Armitage, 1971; Kroeber and LaForge, 1980). Such a distribution can be used to determine...specificity of the alkali-sensitive lesions induced in DNA by high intensity ultraviolet laser radiation", Photochem. Photohiol. 52:509-517 Kroeber , D.W

  6. Applications of free electron lasers in the UV

    Energy Technology Data Exchange (ETDEWEB)

    Couprie, M.E.

    1994-12-31

    The first applications of the UV Free Electron Lasers (FEL) show the advance to a stage of maturity for such sources. Two-color experiments coupling storage ring FEL and synchrotron radiation offer the wide range of use. (TEC). 26 refs., 7 figs., 2 tabs.

  7. UV solid state laser ablation of intraocular lenses

    Science.gov (United States)

    Apostolopoulos, A.; Lagiou, D. P.; Evangelatos, Ch.; Spyratou, E.; Bacharis, C.; Makropoulou, M.; Serafetinides, A. A.

    2013-06-01

    Commercially available intraocular lenses (IOLs) are manufactured from silicone and acrylic, both rigid (e.g. PMMA) and foldable (hydrophobic or hydrophilic acrylic biomaterials), behaving different mechanical and optical properties. Recently, the use of apodizing technology to design new diffractive-refractive multifocals improved the refractive outcome of these intraocular lenses, providing good distant and near vision. There is also a major ongoing effort to refine laser refractive surgery to correct other defects besides conventional refractive errors. Using phakic IOLs to treat high myopia potentially provides better predictability and optical quality than corneal-based refractive surgery. The aim of this work was to investigate the effect of laser ablation on IOL surface shaping, by drilling circular arrays of holes, with a homemade motorized rotation stage, and scattered holes on the polymer surface. In material science, the most popular lasers used for polymer machining are the UV lasers, and, therefore, we tried in this work the 3rd and the 5th harmonic of a Q-switched Nd:YAG laser (λ=355 nm and λ=213 nm respectively). The morphology of the ablated IOL surface was examined with a scanning electron microscope (SEM, Fei - Innova Nanoscope) at various laser parameters. Quantitative measurements were performed with a contact profilometer (Dektak-150), in which a mechanical stylus scanned across the surface of gold-coated IOLs (after SEM imaging) to measure variations in surface height and, finally, the ablation rates were also mathematically simulated for depicting the possible laser ablation mechanism(s). The experimental results and the theoretical modelling of UV laser interaction with polymeric IOLs are discussed in relation with the physical (optical, mechanical and thermal) properties of the material, in addition to laser radiation parameters (laser energy fluence, number of pulses). The qualitative aspects of laser ablation at λ=213 nm reveal a

  8. Experimental investigation on: Laser shock micro-forming process using the mask and flexible pad

    Science.gov (United States)

    Wang, Xiao; Li, Liyin; Shen, Zongbao; Sha, Chaofei; Gao, Shuai; Li, Cong; Sun, Xianqing; Ma, Youjuan; Liu, Huixia

    2017-01-01

    A forming process called the mask and flexible pad laser shock forming was proposed to fabricate the micro-features on the copper foil. In this process, the mask and laser beam were used as rigid punches. Shock waves induced by plasma were used as the source of loading and plasticine was used as a flexible pad. This was a micro scale and high strain rate forming process and the traditional forming method with micro-mold was changed. In the experiment, surface morphology of formed parts was represented and it was found that the mask played a significant role in the forming process. In order to understand the forming process in the experiment, process parameters, including laser pulse energy, numbers of laser pulse and grain size, were analyzed. The experimental results showed that different parameters had different effects on formed parts. The surface quality and the thickness distribution of formed parts were investigated. It was found that formed parts could keep good surface quality after laser shocking and the reasons were explored. The thickness distribution was measured and the thickness thinning rate was calculated. There was no local tightening or rupture in the forming area. In this paper, the micro-features could be obtained on metallic foils and the method of mold-free was proved to be feasible.

  9. UV-laser ablation of sensory cells in living insects

    Science.gov (United States)

    Fuhr, G.; Ronacher, B.; Krahe, R.; Fest, S.; Shirley, S. G.; Rogaschewski, S.

    An experimental set-up for applying pulsed UV-laser ablation to the integument of insects and the high precision of ablation is demonstrated. In order to test for possible detrimental effects on physiological responses, this technique was applied to the ears of migratory locust (Locusta migratoria L.). The handling of living insects, the survival, and physiological response after treatment are described. We selectively interrupted the d-receptor of the tympanal organ, which is the receptor system responsible for the locust's sensitivity in the high-frequency range (>10 kHz). The effects of the laser treatment were tested by determining hearing thresholds in electrophysiological recordings from the tympanal nerves. In agreement with the literature, the interruption of the d-receptors led to a significant shift towards higher values of the thresholds in the high-frequency range. Future perspectives and biological applications of UV-laser ablation are discussed.

  10. Application of UV-LED surface light source in PCB solder mask exposure%UV-LED面光源在PCB阻焊曝光中的应用

    Institute of Scientific and Technical Information of China (English)

    闵秀红

    2013-01-01

    In recent years, the development of the UV-LED, bring revolutionary changes in the field of PCB exposure. It is energy efficient and has constant light intensity, good temperature control, and almost zero maintenance cost. It promotes UV-LED surface light source replacing the traditional exposure lamp and becomes a trend.In accordance with the characteristics of the ultraviolet light source for PCB solder mask exposure process, this paper discusses not only the related technologies to overcome the difficulties in the promotion and application, but also provided solutions through experimental data, analysis of the factors of impact on the uniformity, the time and the resolution of UV-LED surface light source exposure. Using scanning mixed-wavelength UV-LED surface light source exposure mode, the practice shows that it is energy efficient, and the light intensity distribution is uniform and stable, is able to fully meet the requirements of the indicators of the anti-welds exposure process, and the maneuverability is strong, and it will play a catalytic role in the PCB exposure process for quality improvement and energy conservation.%  近年来随着UV-LED的问世,为印制电路板曝光领域带来革命性的变化。其高效节能、恒定的光照强度、优秀的温度控制、几乎为零的维护成本。促使UV-LED面光源替代传统曝光灯成为发展趋势。文章针对印制电路板阻焊曝光工艺紫外光源的特点,论述了推广应用中需要克服的相关技术及解决方法;并通过实验数据,分析出影响UV-LED面光源曝光均匀性、时间、解析度的因素。实践表明,采用扫描式、混合波长的UV-LED面光源曝光方式,高效节能、光强分布均匀稳定、能够完全满足阻焊曝光过程对光源的指标要求,可操作性强,对印制电路板曝光工艺的品质提升与节能降耗将起到推动作用。

  11. Small-Signal Analysis of Performance Characterization of Chaotic Masking Decoding in Injected Semiconductor Lasers

    Institute of Scientific and Technical Information of China (English)

    YAN Sen-Lin

    2005-01-01

    @@ Performance characterization of chaotic masking encoding and decoding is studied in synchronization injected semiconductor lasers under condition of injected-feedback. The modulation response function of chaotic masking encoding and its response factor are theoretically deduced and analysed by small-signal analysis. It is numerically demonstrated that there are peak values between 1.52 GHz and 3.18 GHz when the injection coefficient is between0.2 and 0.8. The chaotic synchronization error equation is theoretically deduced and its root is given by smallsignal analysis under condition of chaotic masking encoding. The chaotic decoding formula is also theoretically demonstrated. There are the least dale values of synchronization errors between the modulation frequencies of 0.79GHz and 1.91 GHz when the injection coefficient is between 0.1 and 0.8 in numerical simulation. The numerical result is well consistent with the theoretical demonstration.

  12. UV laser mediated cell selective destruction by confocal microscopy

    Directory of Open Access Journals (Sweden)

    Giangrande Angela

    2008-04-01

    Full Text Available Abstract Analysis of cell-cell interactions, cell function and cell lineages greatly benefits selective destruction techniques, which, at present, rely on dedicated, high energy, pulsed lasers and are limited to cells that are detectable by conventional microscopy. We present here a high resolution/sensitivity technique based on confocal microscopy and relying on commonly used UV lasers. Coupling this technique with time-lapse enables the destruction and following of any cell(s in any pattern(s in living animals as well as in cell culture systems.

  13. Fabrication of rectangular cross-sectional microchannels on PMMA with a CO2 laser and underwater fabricated copper mask

    Science.gov (United States)

    Prakash, Shashi; Kumar, Subrata

    2017-09-01

    CO2 lasers are commonly used for fabricating polymer based microfluidic devices. Despite several key advantages like low cost, time effectiveness, easy to operate and no requirement of clean room facility, CO2 lasers suffer from few disadvantages like thermal bulging, improper dimensional control, difficulty to produce microchannels of other than Gaussian cross sectional shapes and inclined surface walls. Many microfluidic devices require square or rectangular cross-sections which are difficult to produce using normal CO2 laser procedures. In this work, a thin copper sheet of 40 μm was used as a mask above the PMMA (Polymethyl-methacrylate) substrate while fabricating the microchannels utilizing the raster scanning feature of the CO2 lasers. Microchannels with different width dimensions were fabricated utilizing a CO2 laser in with mask and without-mask conditions. A comparison of both the fabricating process has been made. It was found that microchannels with U shape cross section and rectangular cross-section can efficiently be produced using the with mask technique. In addition to this, this technique can provide perfect dimensional control and better surface quality of the microchannel walls. Such a microchannel fabrication process do not require any post-processing. The fabrication of mask using a nanosecond fiber laser has been discussed in details. An underwater laser fabrication method was adopted to overcome heat related defects in mask preparation. Overall, the technique was found to be easy to adopt and significant improvements were observed in microchannel fabrication.

  14. Pattern fidelity performance from next-generation DUV laser lithography on 65nm masks and wafers

    Science.gov (United States)

    Kiefer, Robert; Buck, Peter; Garg, Vishal; Hickethier, Jason; Jackson, Curt; Manfredo, John; Morgante, Cris; Allen, Paul; White, Michael

    2005-11-01

    Currently, the ALTA 4300 generation Deep Ultra-Violet (DUV) Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth datapath the capability of the tool has been dramatically enhanced. Both the tools diffractive optic element (DOE) and acousto-optic modulator (AOM) have been refined. Additionally, the tools 33x, 0.8NA objective lens has been replaced with a 42x, 0.9NA objective lens. Finally, the tools datapath enhancement has allowed critical level write times to remain less than four hours. Quantitative results of these enhancements will be detailed through reporting of critical feature resolution limits, CD uniformity control, and pattern placement accuracy on mask. Performance will be shown from masks printed pre- and post- hardware upgrade. Experimental results will show actual improvements. In this paper details of the aerial image created when printing wafers with DUV Laser generated photomasks pre- and post-upgrade will be shown. Both 248nm and 193nm source printing with multiple illumination conditions will be discussed. Details of a print test comparison performed on photomasks from each tool configuration will be documented. The print test comparison will include process window characterization from each mask type. A study of the inspectability of the DUV Laser generated photomasks will also be highlighted.

  15. Mask-free and programmable patterning of graphene by ultrafast laser direct writing

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Hao-Yan [College of Optical and Electronical Information, Changchun University of Science and Technology, Changchun (China); Han, Dongdong [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012 (China); Tian, Ye, E-mail: yetian@mail.ccut.edu.cn [College of Electrical and Electronic Engineering, Changchun University of Technology, 2055 Yan’an Street, Changchun (China); Shao, Ruiqiang [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012 (China); Wei, Shu, E-mail: weishu07@mails.jlu.edu.cn [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012 (China)

    2014-02-17

    Graphical abstract: - Highlights: • We present a mask-free and programmable patterning of graphene. • Ultrafast laser can homogeneously reduce graphene oxides into micropatterns. • Desired graphene micropatterns could be created on flexible substrates. • Laser exposure duration shows influence on the conductivity of reduced graphene. • The method holds promise for fabrication and integration of graphene electronics. - Abstract: Reported here is a mask-free and programmable patterning of graphene by using femtosecond laser direct writing on graphene oxide (GO) films. Take advantage of the ultrahigh instantaneous intensity of the femtosecond laser pulse, and especially its nonlinear interactions with materials, the GO could be efficiently reduced under atmospheric condition at room temperature. Moreover, the designability of femtosecond laser direct writing (FsLDW) technique allow making graphene micropatterns arbitrarily according to the preprogrammed structures, which provides the feasibility for rational design, flexible fabrication and integration of graphene-based micro-devices. Raman spectra show that the reduced and patterned region is very homogeneous, which is confirmed by the almost consistent I{sub D}/I{sub G} ratio. The novel graphene patterning technique would provide a technical support for the development of graphene-based micro-devices for future electronics.

  16. UV LASER INITIATED STEREOSELECTIVE HOMOGENEOUS CATALYSIS POLYMERIZATION OF PHENYLACETYLENE

    Institute of Scientific and Technical Information of China (English)

    ZHANG Jie; SHE Yongbo; FU Kejian; ZHOU Yihua

    1993-01-01

    In this paper, the stereoselective homogeneous catalysis polymerization of phenylacetylene by using two kinds of catalysts W(CO)5CH3I and W(CO)4I2 produced from UV laser photolysis of W (CO)6 in CH3I, I2 -C6H6 and CHI3 -C6H6 respectively was studied . The effects of laser energy,laser irradiation time and lifetime of catalyst on the polymerization of phenylacetylene were discussed . The photoproducts of W (CO)6 in CH3I, I2 - C6H6 and CHI3 - C6H6 were determined by IR spectra. The structures of polyphenylacetylene obtained by W (CO)5CH3I and W (CO)4I2 catalysts were characterized by IR spectra and 1H NMR spectra.

  17. UV laser deposition of metal films by photogenerated free radicals

    Science.gov (United States)

    Montgomery, R. K.; Mantei, T. D.

    1986-01-01

    A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

  18. Rapid and mask-less laser-processing technique for the fabrication of microstructures in polydimethylsiloxane

    Energy Technology Data Exchange (ETDEWEB)

    Sones, C.L., E-mail: cls@orc.soton.ac.uk; Katis, I.N.; Mills, B.; Feinaeugle, M.; Mosayyebi, A.; Butement, J.; Eason, R.W.

    2014-04-01

    Highlights: • The paper reports use of laser-based methods for structuring PDMS-moulds. • The laser-based methods used include ablation and photo-polymerisation. • These methods employ a digital multi-mirror device as a spatial light modulator. • PDMS moulds were used to demonstrate micro-contact printing of proteins. - Abstract: We report a rapid laser-based method for structuring polydimethylsiloxane (PDMS) on the micron-scale. This mask-less method uses a digital multi-mirror device as a spatial light modulator to produce a given spatial intensity pattern to create arbitrarily shaped structures via either ablation or multi-photon photo-polymerisation in a master substrate, which is subsequently used to cast the complementary patterns in PDMS. This patterned PDMS mould was then used for micro-contact printing of ink and biological molecules.

  19. UV laser-induced fluorescence spectroscopy and laser Doppler flowmetry in the diagnostics of alopecia

    Science.gov (United States)

    Skomorokha, Diana P.; Pigoreva, Yulia N.; Salmin, Vladimir V.

    2016-04-01

    Development of optical biopsy methods has a great interest for medical diagnostics. In clinical and experimental studies it is very important to analyze blood circulation quickly and accurately, thereby laser Doppler flowmetry (LDF) is widely used. UV laser-induced fluorescence spectroscopy (UV LIFS) is express highly sensitive and widely-spread method with no destructive impact, high excitation selectivity and the possibility to use in highly scattering media. The goal of this work was to assess a correlation of UV laser-induced fluorescence spectroscopy and laser Doppler flowmetry parameters, and a possibility to identify or to differentiate various types of pathological changes in tissues according to their autofluorescence spectra. Three groups of patients with diffuse (symptomatic) alopecia, androgenic alopecia, and focal alopecia have been tested. Each groups consisted of not less than 20 persons. The measurements have been done in the parietal and occipital regions of the sculls. We used the original automated spectrofluorimeter to record autofluorescence spectra, and standard laser Doppler flowmeter BLF-21 (Transonic Systems, Inc., USA) to analyze the basal levels of blood circulation. Our results show that UV LIFS accurately distinguishes the zones with different types of alopecia. We found high correlation of the basal levels of blood circulation and the integrated intensity of autofluorescence in the affected tissue.

  20. SOAR Adaptive Module (SAM): seeing improvement with a UV laser

    CERN Document Server

    Tokovinin, Andrei; Tighe, Roberto; Schurter, Patricio; Martinez, Manuel; Thomas, Sandrine; van der Bliek, Nicole

    2016-01-01

    The adaptive module of the 4.1-m SOAR telescope, SAM, corrects ground-layer turbulence using a UV laser guide star. It has been commissioned in 2013 and it is in regular science operation since 2014. SAM works with the CCD imager covering a 3' field or with the speckle camera. It operates routinely and stably, delivering resolution in the I band equal to the free-atmosphere seeing. This paper describes the SAM system as a whole, providing essential reference for its users and technical information of interest to instrumentalists. Operation of the instrument, its performance, and science projects done with SAM so far are reviewed.

  1. Determination of additives in PVC material by UV laser ablation inductively coupled plasma atomic emission spectrometry

    Science.gov (United States)

    Hemmerlin, M.; Mermet, J. M.; Bertucci, M.; Zydowicz, P.

    1997-04-01

    UV laser ablation inductively coupled plasma atomic emission spectrometry (LA-ICP-AES) has been applied to the direct determination of additives in solid poly(vinyl chloride) materials. A Nd:YAG laser, operating at its fourth harmonic (266 nm), was used with a beam masking device, in the most reproducible conditions, to introduce solid particles into the plasma torch of a simultaneous ICP-AES system. Emphasis was placed on both precision and accuracy in the analysis of PVC materials by LA-ICP-AES. A series of six in-house PVC reference materials was prepared by incorporating several additives in increasing concentrations. Three alternative methods were evaluated to certify the amount of incorporated elements: ICP-AES with sample dissolution, NAA and XRF. Satisfactory results and good agreement were obtained for seven elements (Al, Ca, Cd, Mg, Sb, Sn and Ti) among the ten incorporated. Sample homogeneity appeared to be satisfactory, and calibration graphs obtained by LA-ICP-AES for several elements are presented. Finally, the performance of the technique in terms of repeatability (1.6-5%), reproducibility (2-5%), and limits of detection was investigated.

  2. Laser ablation of borosilicate glass with high power shaped UV nanosecond laser pulses

    Science.gov (United States)

    von Witzendorff, Philipp; Bordin, Andrea; Suttmann, Oliver; Patel, Rajesh S.; Bovatsek, James; Overmeyer, Ludger

    2016-03-01

    The application of thin borosilicate glass as interposer material requires methods for separation and drilling of this material. Laser processing with short and ultra-short laser pulses have proven to enable high quality cuts by either direct ablation or internal glass modification and cleavage. A recently developed high power UV nanosecond laser source allows for pulse shaping of individual laser pulses. Thus, the pulse duration, pulse bursts and the repetition rate can be set individually at a maximum output power of up to 60 W. This opens a completely new process window, which could not be entered with conventional Q-switched pulsed laser sources. In this study, the novel pulsed UV laser system was used to study the laser ablation process on 400 μm thin borosilicate glass at different pulse durations ranging from 2 - 10 ns and a pulse burst with two 10 ns laser pulses with a separation of 10 ns. Single line scan experiments were performed to correlate the process parameters and the laser pulse shape with the ablation depth and cutting edge chipping. Increasing the pulse duration within the single pulse experiments from 2 ns to longer pulse durations led to a moderate increase in ablation depth and a significant increase in chipping. The highest material removal was achieved with the 2x10 ns pulse burst. Experimental data also suggest that chipping could be reduced, while maintaining a high ablation depth by selecting an adequate pulse overlap. We also demonstrate that real-time combination of different pulse patterns during drilling a thin borosilicate glass produced holes with low overall chipping at a high throughput rate.

  3. Laser-induced nanostructures on a polymer irradiated through a contact mask

    Energy Technology Data Exchange (ETDEWEB)

    Neděla, O. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Slepička, P., E-mail: petr.slepicka@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Malý, J.; Štofík, M. [Department of Biology, Faculty of Science, J.E. Purkyně University, 400 96 Usti nad Labem (Czech Republic); Švorčík, V. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)

    2014-12-01

    Highlights: • The unique nanopatterning method of PEN was proposed. • Laser treatment through micrometer slit was utilized. • Dimensions of nanostructures can be precisely controlled. • Laser treatment changes the PEN surface chemistry and morphology (sensor applications). - Abstract: The nanopatterning method applied through micrometer slit for polyethylene naphthalate (PEN) substrate was proposed in this paper. Surface roughness, formation of nanoscale ripple-like structures and the dependence of their dimensions on the value of laser fluence was determined by atomic force and laser confocal microscopy, and compared with values obtained from samples irradiated directly (without a contact mask) under similar conditions. The morphology of the unirradiated surface of the substrate in between the slits is also studied, as well as the morphology of the transitional area between the irradiated and unirradiated surface. Thin layer of gold was deposited on selected samples. Chemical composition of the surface was determined from XPS spectra. The potential application of this research can be found predominantly in the field of selective sensor applications, where the designated area for the consecutive grafting procedures is of great importance.

  4. Vibration-Assisted Femtosecond Laser Drilling with Controllable Taper Angles for AMOLED Fine Metal Mask Fabrication

    Directory of Open Access Journals (Sweden)

    Wonsuk Choi

    2017-02-01

    Full Text Available This study investigates the effect of focal plane variation using vibration in a femtosecond laser hole drilling process on Invar alloy fabrication quality for the production of fine metal masks (FMMs. FMMs are used in the red, green, blue (RGB evaporation process in Active Matrix Organic Light-Emitting Diode (AMOLED manufacturing. The taper angle of the hole is adjusted by attaching the objective lens to a micro-vibrator and continuously changing the focal plane position. Eight laser pulses were used to examine how the hole characteristics vary with the first focal plane’s position, where the first pulse is focused at an initial position and the focal planes of subsequent pulses move downward. The results showed that the hole taper angle can be controlled by varying the amplitude of the continuously operating vibrator during femtosecond laser hole machining. The taper angles were changed between 31.8° and 43.9° by adjusting the vibrator amplitude at a frequency of 100 Hz. Femtosecond laser hole drilling with controllable taper angles is expected to be used in the precision micro-machining of various smart devices.

  5. UV-laser-assisted liquid phase fluorination of PMMA

    Science.gov (United States)

    Wochnowski, C.; Di Ferdinando, M.; Giolli, C.; Vollertsen, F.; Bardi, U.

    2007-10-01

    Polymethylmethacrylate (PMMA) substrate was covered with liquid 1,2,3,5-tetrafluorobenzene by spin coating. Then the sample was irradiated by a KrF-excimer laser ( λ = 248 nm). Thus, fluorine is released from the fluorine-containing precursor diffusing into the polymeric substrate material where it is expected to substitute the hydrogen atoms of the polymeric molecule and form a water-repellent (hydrophobic) fluorinated polymer. After drying out the polymeric substrate, the sample surface was investigated by SEM, EDX, XPS and contact angle measurement method in order to determine the fluorine content and the wettability of the treated polymeric surface as well as the substitution sites inside the polymeric molecule. The measurements indicate some chemically bonded fluorine at the top of the sample layer. A UV-photochemical fluorination mechanism is proposed based on the XPS spectra evaluation.

  6. Imaging Single ZnO Vertical Nanowire Laser Cavities using UV-Laser Scanning Confocal Microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Gargas, D.J.; Toimil-Molares, M.E.; Yang, P.

    2008-11-17

    We report the fabrication and optical characterization of individual ZnO vertical nanowire laser cavities. Dilute nanowire arrays with interwire spacing>10 ?m were produced by a modified chemical vapor transport (CVT) method yielding an ideal platform for single nanowire imaging and spectroscopy. Lasing characteristics of a single vertical nanowire are presented, as well as high-resolution photoluminescence imaging by UV-laser scanning confocal microscopy. In addition, three-dimensional (3D) mapping of the photoluminescence emission performed in both planar and vertical dimensions demonstrates height-selective imaging useful for vertical nanowires and heteronanostructures emerging in the field of optoelectronics and nanophotonics.

  7. SO2 Spectroscopy with A Tunable UV Laser

    Science.gov (United States)

    Morey, W. W.; Penney, C. M.; Lapp, M.

    1973-01-01

    A portion of the fluorescence spectrum of SO2 has been studied using a narrow wavelength doubled dye laser as the exciting source. One purpose of this study is to evaluate the use of SO2 resonance re-emission as a probe of SO2 in the atmosphere. When the SO2 is excited by light at 300.2 nm, for example, a strong reemission peak is observed which is Stokes-shifted from the incident light wavelength by the usual Raman shift (the VI symmetric vibration frequency 1150.5/cm ). The intensity of this peak is sensitive to small changes (.01 nm) in the incident wavelength. Measurements of the N2 quenching and self quenching of this re-emission have been obtained. Preliminary analysis of this data indicates that the quenching is weak but not negligible. The dye laser in our system is pumped by a pulsed N2 laser. Tuning 'and spectral narrowing are accomplished using a telescope-echelle grating combination. In a high power configuration the resulting pulses have a spectral width of about 5 x 10(exp -3) nm and a time duration of about 6 nsec. The echelle grating is rotated by a digital stepping motor, such that each step shifts the wavelength by 6 x 10(exp -4) nm. In addition to the tunable, narrow wavelength uv source and spectral analysis of the consequent re-emission, the system also provides time resolution of the re-emitted light to 6 nsec resolution. This capability is being used to study the lifetime of low pressure S02 fluorescence at different wavelengths and pressures.

  8. Mask-Free Patterning of High-Conductivity Metal Nanowires in Open Air by Spatially Modulated Femtosecond Laser Pulses.

    Science.gov (United States)

    Wang, Andong; Jiang, Lan; Li, Xiaowei; Liu, Yang; Dong, Xianzi; Qu, Liangti; Duan, Xuanming; Lu, Yongfeng

    2015-10-28

    A novel high-resolution nanowire fabrication method is developed by thin-film patterning using a spatially modulated femtosecond laser pulse. Deep subwavelength (≈1/13 of the laser wavelength) and high conductivity (≈1/4 of the bulk gold) nanowires are fabricated in the open air without using masks, which offers a single-step arbitrary direct patterning approach for electronics, plasmonics, and optoelectronics nanodevices.

  9. Planar waveguide Michelson interferometer fabricated by using 157nm mask laser micromachining

    Science.gov (United States)

    Bao, Haihong; Ran, Zengling; Wu, Xuezhong; Yang, Ke; Jiang, Yuan; Rao, Yunjiang

    2015-07-01

    A Michelson interferometer is fabricated on silica planar waveguide by using the one-step technology based on 157nm mask laser micromachining. The fabrication time for one device is ~10s. Experimental results show that such an interferometer has an excellent fringe contrast of >20dB. Its temperature and refractive index (RI) responses are tested by observing the wavelength shift of the interferometric fringes, which shows linear characteristics with a thermo-coefficient of ~9.5pm/°C and a RI-coefficient of ~36.7nm/RIU, respectively. The fabrication technology may pave a new way for direct writing of planar silica waveguide devices for sensing applications with high efficiency and quality.

  10. Décontamination nucléaire par laser UV

    Science.gov (United States)

    Delaporte, Ph.; Gastaud, M.; Marine, W.; Sentis, M.; Uteza, O.; Thouvenot, P.; Alcaraz, J. L.; Le Samedy, J. M.; Blin, D.

    2003-06-01

    Le développement et l'utilisation de procédés propres pour le nettoyage ou la préparation de surfaces est l'une des priorités du milieu industriel. Cet intérêt est d'autant plus grand dans le domaine du nucléaire pour lequel la réduction des déchets est un axe de recherche important. Un dispositif de décontamination nucléaire par laser UV impulsionnel a été développé et testé. Il est composé. d'un laser à excimères de 1kW, d'un faisceau de fibres optiques et d'un dispositif de récupération des particules. Les essais réalisés en milieu actif ont démontré sa capacité à nettoyer des surfaces métalliques polluées par différents radioéléments avec des facteurs de décontamination généralement supérieurs à 10. Ce dispositif permet de décontaminer de grandes surfaces de géométrie simple en réduisant fortement la génération de déchets secondaires. Il est, à ce jour et dans ces conditions d'utilisations, le procédé de décontamination par voie sèche le plus efficace.

  11. Femtosecond laser direct hard mask writing for selective facile micron-scale inverted-pyramid patterning of silicon

    Science.gov (United States)

    Kumar, K.; Lee, K. K. C.; Herman, P. R.; Nogami, J.; Kherani, N. P.

    2012-11-01

    We report on the fabrication of high-fidelity inverted-pyramids in crystalline silicon (c-Si) at the 1 μm scale through the selective removal of a silicon nitride (SiNx) hard-mask with a 522 nm femtosecond (fs) laser and subsequent alkaline potassium hydroxide (KOH) etching. Through a series of systematic experiments on a range of hard-mask thicknesses, the use of 20 nm thick SiNx film yielded a 0.6 μm diameter laser-ejected aperture in the hard-mask at a single pulse fluence of 0.45 J cm-2, resulting in 1 μm wide inverted-pyramid structure in c-Si after KOH etching. Anisotropic KOH etching of the partially amorphized c-Si underlying the fs-laser patterned hard mask was found to render clean (111) planes of c-Si. An array of inverted-pyramids on c-Si surfaces as large as 4 cm2 was produced with a defect density of less than 1 in 104. This facile, non-contact, and cleanroom-independent technique serves a variety of applications including anti-reflective texturing of thin c-Si for photovoltaics, wafer marking, labeling, and fabrication of microfluidic and optical devices or laboratories on silicon wafers.

  12. Soft-Matter Printed Circuit Board with UV Laser Micropatterning.

    Science.gov (United States)

    Lu, Tong; Markvicka, Eric J; Jin, Yichu; Majidi, Carmel

    2017-07-05

    When encapsulated in elastomer, micropatterned traces of Ga-based liquid metal (LM) can function as elastically deformable circuit wiring that provides mechanically robust electrical connectivity between solid-state elements (e.g., transistors, processors, and sensor nodes). However, LM-microelectronics integration is currently limited by challenges in rapid fabrication of LM circuits and the creation of vias between circuit terminals and the I/O pins of packaged electronics. In this study, we address both with a unique layup for soft-matter electronics in which traces of liquid-phase Ga-In eutectic (EGaIn) are patterned with UV laser micromachining (UVLM). The terminals of the elastomer-sealed LM circuit connect to the surface mounted chips through vertically aligned columns of EGaIn-coated Ag-Fe2O3 microparticles that are embedded within an interfacial elastomer layer. The processing technique is compatible with conventional UVLM printed circuit board (PCB) prototyping and exploits the photophysical ablation of EGaIn on an elastomer substrate. Potential applications to wearable computing and biosensing are demonstrated with functional implementations in which soft-matter PCBs are populated with surface-mounted microelectronics.

  13. Regular self-microstructuring on CR39 using high UV laser dose

    Energy Technology Data Exchange (ETDEWEB)

    Parvin, P., E-mail: parvin@aut.ac.ir [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Tehran (Iran, Islamic Republic of); Refahizadeh, M. [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Tehran (Iran, Islamic Republic of); Mortazavi, S.Z. [Physics Department, Faculty of Science, Imam Khomeini International University, P.O. Box 34149-16818, Qazvin (Iran, Islamic Republic of); Silakhori, K. [Laser and Optics Research School, P.O. Box 11365-8486, Tehran (Iran, Islamic Republic of); Mahdiloo, A. [Mining and Metallurgical Engineering Department, Amirkabir University of Technology, P.O. Box 1591634311, Tehran (Iran, Islamic Republic of); Aghaii, P. [Physics Department, Amirkabir University of Technology, P.O. Box 15875-4413, Tehran (Iran, Islamic Republic of)

    2014-02-15

    The UV laser induced replicas in the form of self-lining microstructures are created by high dose (with high fluence) ArF laser irradiation on CR39. Microstructures as the self-induced contours, in the form of concentric circles, appear when the laser fluence is well above the ablation threshold. It leads to the regular periodic parallel lines, i.e. circles with large radii having spatial separation 100–200 nm and line width 300–600 nm, where the number of shots increases to achieve higher UV doses. The surface wettability is also investigated after laser texturing to exhibit that a notable hydrophilicity takes place at high doses.

  14. 3D printed facial laser scans for the production of localised radiotherapy treatment masks - A case study.

    Science.gov (United States)

    Briggs, Matthew; Clements, Helen; Wynne, Neil; Rennie, Allan; Kellett, Darren

    This study investigates the use of 3D printing for patients that require localised radiotherapy treatment to the face. The current process involves producing a lead mask in order to protect the healthy tissue from the effects of the radiotherapy. The mask is produced by applying a thermoplastic sheet to the patient's face and allowing to set hard. This can then be used as a mould to create a plaster impression of the patient's face. A sheet of lead is then hammered on to the plaster to create a bespoke fitted face mask. This process can be distressing for patients and can be problematic when the patient is required to remain motionless for a prolonged time while the thermoplastic sets. In this study, a 1:1 scale 3D print of a patient's face was generated using a laser scanner. The lead was hammered directly on to the surface of the 3D print in order to create a bespoke fitted treatment mask. This eliminated the thermoplastic moulding stage and significantly reduced the time needed for the patient to be in clinic. The higher definition impression of the the face resulted in a more accurate, better fitting treatment mask.

  15. Modeling of Output Characteristics of a UV Cu+ Ne-CuBr Laser

    Directory of Open Access Journals (Sweden)

    Snezhana Georgieva Gocheva-Ilieva

    2012-01-01

    Full Text Available This paper examines experiment data for a Ne-CuBr UV copper ion laser excited by longitudinal pulsed discharge emitting in multiline regime. The flexible multivariate adaptive regression splines (MARSs method has been used to develop nonparametric regression models describing the laser output power and service life of the devices. The models have been constructed as explicit functions of 9 basic input laser characteristics. The obtained models account for local nonlinearities of the relationships within the various multivariate subregions. The built best MARS models account for over 98% of data. The models are used to estimate the investigated output laser characteristics of existing UV lasers. The capabilities for using the models in predicting existing and future experiments have been demonstrated. Specific analyses have been presented comparing the models with actual experiments. The obtained results are applicable for guiding and planning the engineering experiment. The modeling methodology can be applied for a wide range of similar lasers and laser devices.

  16. Combined Advanced Finishing and UV-Laser Conditioning for Producing UV-Damage-Resistant Fused Silica Optics

    Energy Technology Data Exchange (ETDEWEB)

    Menapace, J A; Penetrante, B; Golini, D; Slomba, A; Miller, P E; Parham, T; Nichols, M; Peterson, J

    2001-11-01

    Laser induced damage initiation on fused silica optics can limit the lifetime of the components when used in high power UV laser environments. Foe example in inertial confinement fusion research applications, the optics can be exposed to temporal laser pulses of about 3-nsec with average fluences of 8 J/cm{sup 2} and peak fluences between 12 and 15 J/cm{sup 2}. During the past year, we have focused on optimizing the damage performance at a wavelength of 355-nm (3{omega}), 3-nsec pulse length, for optics in this category by examining a variety of finishing technologies with a challenge to improve the laser damage initiation density by at least two orders of magnitude. In this paper, we describe recent advances in improving the 3{omega} damage initiation performance of laboratory-scale zirconium oxide and cerium oxide conventionally finished fused silica optics via application of processes incorporating magnetorheological finishing (MRF), wet chemical etching, and UV laser conditioning. Details of the advanced finishing procedures are described and comparisons are made between the procedures based upon large area 3{omega} damage performance, polishing layer contamination, and optical subsurface damage.

  17. Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

    Science.gov (United States)

    Kumar, Kitty; Lee, Kenneth K. C.; Nogami, Jun; Herman, Peter R.; Kherani, Nazir P.

    2013-03-01

    This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si) into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

  18. Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

    Directory of Open Access Journals (Sweden)

    Nogami Jun

    2013-03-01

    Full Text Available This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

  19. Measurement of Hot Electron Spectrum During the Interaction of Ultrashort Pulse UV Laser With Solid Target

    Institute of Scientific and Technical Information of China (English)

    LIYe-jun; SHANYu-sheng; ZHANGJi; ZHANGHai-feng; TANGXiu-zhang; WANGLei-jian

    2003-01-01

    The hot electron spectrum was measured using electron magnetic spectrometer through the irradiation of solid Cu target by an intense, UV (248 nm) femtosecond (440 fs) laser pulse with free pre-pulse, and the intensity of laser is 1017 W/cm2. We find the electron spectrum presents two temperatures Maxwellian distribution.

  20. Lasers, extreme UV and soft X-ray

    Energy Technology Data Exchange (ETDEWEB)

    Nilsen, Joseph [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA) laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.

  1. A method of laser micro-polishing for metallic surface using UV nano-second pulse and CW lasers

    CERN Document Server

    Jang, Pong-Ryol; Ji, Kum-Hyok; Kim, Nam-Chol

    2014-01-01

    During laser micro-polishing, the constant control of laser energy density is a key technology to improve the surface roughness. In this paper, a method which controls the energy density of UV(ultraviolet) pulse laser in real time with the control of CW(continuous wave) laser spot size in laser micro-polishing for metallic surface was presented. The experimental and analytical considerations of several influence factors such as laser spot size, fusion zone and focal offset were investigated. In addition, using a laser micro-polishing system manufactured with this method, the laser micro-polishing experiments on the two different surface shapes of stainless steel 316L were conducted. For the inclined or curved surface, the surface roughness improvements of up to 56.4% and 57.3% were respectively obtained, and the analysis of the results were discussed.

  2. Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

    Science.gov (United States)

    Sjoberg, Henrik; Chauvet, Jean-Michel; Harkesjo, Jan; Hogfeldt, Peter; Karawajczyk, Andrzej; Karlsson, Johan; Kjellberg, Lars; Mahlen, Jonas; Beyerl, Angela; Vedenpaa, Jukka; Goodoree, Robin; Bjuggren, Mans; Aman, Johan

    2004-08-01

    With each new technology generation, photomask manufacturing faces increasing complexity due to shrinking designs and accelerating use of reticle enhancement techniques. Denser and more complex patterns on the mask result in lower yields and long write and turn-around times, important factors for the rapidly increasing mask related costs in IC manufacturing. Laser pattern generators operating at DUV wavelengths were recently introduced to provide cost effective alternatives to electron-beam systems for printing of high-end photomasks. DUV wavelengths provide the required resolution and pattern fidelity. Optical tools that use raster writing principles and massively parallel printing ensure short and predictable write times for photomasks almost independent of pattern complexity. One such high-volume production system, the Sigma7300, uses spatial light modulator (SLM) technology and a 248 nm excimer laser for printing. Partially coherent imaging and multi-pass printing as in a lithography scanner further increases resolution and pattern accuracy. With four-pass printing the system provides resolution and pattern accuracy meeting mask requirements for critical layers at the 90-nm node and sub-critical layers at the 65-nm node and beyond. The paper discusses how mask layout can be optimized to take full advantage of the speed potential provided by the SLM-based writer. It shows how flexible use of the writing principle can provide cost effective writing solutions for many layers in high-end mask sets. Resolution and pattern accuracy results from the Sigma7300 will be presented together with write times for different types of designs.

  3. UV laser ablation of parylene films from gold substrates

    Energy Technology Data Exchange (ETDEWEB)

    O. R. Musaev, P. Scott, J. M. Wrobel, and M. B. Kruger

    2009-11-19

    Parylene films, coating gold substrates, were removed by laser ablation using 248 nm light from an excimer laser. Each sample was processed by a different number of pulses in one of three different environments: air at atmospheric pressure, nitrogen at atmospheric pressure, and vacuum. The laser-induced craters were analyzed by optical microscopy and x-ray photoelectron spectroscopy. Multi-pulse ablation thresholds of gold and parylene were estimated.

  4. Pulsed laser facilities operating from UV to IR at the Gas Laser Lab of the Lebedev Institute

    Science.gov (United States)

    Ionin, Andrei; Kholin, Igor; Vasil'Ev, Boris; Zvorykin, Vladimir

    2003-05-01

    Pulsed laser facilities developed at the Gas Lasers Lab of the Lebedev Physics Institute and their applications for different laser-matter interactions are discussed. The lasers operating from UV to mid-IR spectral region are as follows: e-beam pumped KrF laser (λ= 0.248 μm) with output energy 100 J; e-beam sustained discharge CO2(10.6 μm) and fundamental band CO (5-6 μm) lasers with output energy up to ~1 kJ; overtone CO laser (2.5-4.2 μm) with output energy ~ 50 J and N2O laser (10.9 μm) with output energy of 100 J; optically pumped NH3 laser (11-14 μm). Special attention is paid to an e-beam sustained discharge Ar-Xe laser (1.73 μm ~ 100 J) as a potential candidate for a laser-propulsion facility. The high energy laser facilities are used for interaction of laser radiation with polymer materials, metals, graphite, rocks, etc.

  5. Evaluation of UV absorption coefficient in laser-modified fused silica

    Energy Technology Data Exchange (ETDEWEB)

    Negres, R A; Burke, M W; Sutton, S B; DeMange, P; Feit, M D; Demos, S G

    2006-08-21

    Laser-induced damage in transparent dielectrics leads to the formation of laser-modified material as a result of exposure to extreme localized temperatures and pressures. In this work, we used an infrared thermal imaging system in combination with a fluorescence microscope to map the dynamics of the local surface temperature and fluorescence intensity under cw, UV excitation of laser-modified fused silica within a damage site. Based on a thermal diffusion model, we estimate the energy deposited via linear absorption mechanisms and derive the absorption coefficient of the modified material. In addition, irreversible changes in the absorption following extended laser exposure were observed.

  6. Effect of UV Laser Conditioning on the Structure of KDP Crystal

    Directory of Open Access Journals (Sweden)

    Decheng Guo

    2014-01-01

    Full Text Available Multiparametric raster scanning experiments for KDP crystals are carried out to study the laser conditioning efficiency as a function of laser fluence, fluence step, and pulse sequence by using ultraviolet (UV laser irradiation with pulse duration of approximately 7 ns. It indicates that damage resistance of KDP can be enhanced after conditioning process. And laser conditioning efficiency depends on the maximal fluence which is below the damage threshold. Raman spectra and photothermal absorption have also been studied on KDP crystals before and after multiparametric laser conditioning. Photothermal absorption data reveal that absorbance of conditioned KDP crystal decreases with the increase of laser fluence and the damage threshold of low absorption area is higher. Raman analysis reveals that the effectiveness of laser conditioning relies mainly on the individual mode of PO4 molecule.

  7. UV laser spectroscopic measurements in jet engine combustion exit flows

    Energy Technology Data Exchange (ETDEWEB)

    Shirley, J.A. (United Technologies Research Center, East Hartford, CT (United States))

    1992-01-01

    Laser diagnostic measurements, which are excited with a narrowband krypton fluoride laser, have been made at the exit of a jet engine combustor. Spectra of Raman scattering and laser induced fluorescence were measured with a 0.5 meter spectrograph equipped with a diode array detector. For these demonstration tests, the combustor was operated at two flow rates including conditions corresponding to the 90 percent power level, with jet fuel and methane. Nitrogen Raman spectra are free of band interference. However, the signal levels are lower than expected. Sources of signal losses are discussed. 27 refs.

  8. HIGH AVERAGE POWER UV FREE ELECTRON LASER EXPERIMENTS AT JLAB

    Energy Technology Data Exchange (ETDEWEB)

    Douglas, David; Evtushenko, Pavel; Gubeli, Joseph; Hernandez-Garcia, Carlos; Legg, Robert; Neil, George; Powers, Thomas; Shinn, Michelle D; Tennant, Christopher

    2012-07-01

    Having produced 14 kW of average power at {approx}2 microns, JLAB has shifted its focus to the ultraviolet portion of the spectrum. This presentation will describe the JLab UV Demo FEL, present specifics of its driver ERL, and discuss the latest experimental results from FEL experiments and machine operations.

  9. Polarisation Control of DFB Fibre Laser Using UV-Induced Birefringent Phase-Shift

    DEFF Research Database (Denmark)

    Philipsen, Jacob Lundgreen; Lauridsen, Vibeke Claudia; Berendt, Martin Ole;

    1998-01-01

    The polarisation properties of a distributed feedback (DFB) fibre laser are investigated experimentally. A birefringent phase-shift is induced by side illumination of the centre part of the lasing structure with ultraviolet (UV) light and it is experimentally shown that the birefringence of the p......The polarisation properties of a distributed feedback (DFB) fibre laser are investigated experimentally. A birefringent phase-shift is induced by side illumination of the centre part of the lasing structure with ultraviolet (UV) light and it is experimentally shown that the birefringence...

  10. UV and RIR matrix assisted pulsed laser deposition of organic MEH-PPV films

    DEFF Research Database (Denmark)

    Christensen, Bo Toftmann; Papantonalis, M.R.; Auyeung, R.C.Y.

    2004-01-01

    were analyzed by Fourier transform infrared spectroscopy, UV-visible absorbance and photoluminescence. Photoluminescent material was deposited by RIR-MAPLE and 248-nm MAPLE, while the RIR-PLD and 193-nm-MAPLE depositions displayed the smoothest surfaces but did not show photoluminescence. (C) 2003......-PLD). For the first time resonant infrared matrix assisted pulsed laser evaporation (RIR-MAPLE) was successfully demonstrated on a luminescent polymer system. In addition to this, an excimer laser has been used for UV-MAPLE depositions at 193 and 248-nm irradiation. Films deposited onto NaCl and quartz substrates...

  11. Interaction of UV-Laser Radiation with Molecular Surface Films.

    Science.gov (United States)

    2014-09-26

    physics of organometallics on surfaces and in the gas phase, and the first observation of surface enhanced chemistry . DI ~(B ~ _ __ _ __ _ ___E_ _ 20...reverse if nee~tary an~d Identify by biock number) FIEL GROP SU GR- Laser, Microelectronics, Surface Chemistry 19 ABSTRACT i CoiEIDue on reverset of...eke chmry and iden NlY by bloch numberg -he surface chemistry of Laser Photodeposition has been explored. The findings include the photodissociation

  12. 100-J UV laser for dynamic compression research

    Science.gov (United States)

    Zweiback, J.; Fochs, S. F.; Bromage, J.; Broege, D.; Cuffney, R.; Currier, Z.; Dorrer, C.; Ehrich, B.; Engler, J.; Guardalben, M.; Kephalos, N.; Marozas, J.; Roides, R.; Zuegel, J.

    2016-03-01

    A 100-J, 351-nm laser has been developed for the Dynamic Compression Sector located at the Advanced Photon Source. This laser will drive shocks in solid-state materials which will be probed by picosecond x-ray pulses available from the synchrotron source. The laser utilizes a state-of-the-art fiber front end providing pulse lengths up to 20 ns with pulse shapes tailored to optimize shock trajectories. A diode-pumped Nd:glass regenerative amplifier is followed by a four-pass, flash-lamp-pumped rod amplifier. The regenerative amplifier is designed to produce up to 20 mJ with high stability. The final amplifier uses a six-pass, 15-cm, Nd:glass disk amplifier based on an OMEGA laser design. A KDP Type-II/Type-II frequency tripler configuration converts the 1053-nm laser output to a wavelength of 351 nm and the ultraviolet beam is image relayed to the target chamber. Smoothing by Spectral Dispersion and polarization smoothing have been optimized to produce uniform shocks in the materials to be tested. Custom control software collects all diagnostic information and provides a central location for all aspects of laser operation.

  13. Single-mode, All-Solid-State Nd:YAG Laser Pumped UV Converter

    Science.gov (United States)

    Prasad, Narasimha S.; Armstrong, Darrell, J.; Edwards, William C.; Singh, Upendra N.

    2008-01-01

    In this paper, the status of a high-energy, all solid-state Nd:YAG laser pumped nonlinear optics based UV converter development is discussed. The high-energy UV transmitter technology is being developed for ozone sensing applications from space based platforms using differential lidar technique. The goal is to generate greater than 200 mJ/pulse with 10-50 Hz PRF at wavelengths of 308 nm and 320 nm. A diode-pumped, all-solid-state and single longitudinal mode Nd:YAG laser designed to provide conductively cooled operation at 1064 nm has been built and tested. Currently, this pump laser provides an output pulse energy of >1 J/pulse at 50 Hz PRF and a pulsewidth of 22 ns with an electrical-to-optical system efficiency of greater than 7% and a M(sup 2) value of <2. The single frequency UV converter arrangement basically consists of an IR Optical Parametric Oscillator (OPO) and a Sum Frequency Generator (SFG) setups that are pumped by 532 nm wavelength obtained via Second Harmonic Generation (SHG). In this paper, the operation of an inter cavity SFG with CW laser seeding scheme generating 320 nm wavelength is presented. Efforts are underway to improve conversion efficiency of this mJ class UV converter by modifying the spatial beam profile of the pump laser.

  14. Laser Meter of Atmospheric Inhomogeneity Properties in UV Spectral Range

    Directory of Open Access Journals (Sweden)

    S. E. Ivanov

    2015-01-01

    Full Text Available Development of laser systems designed to operate in conditions of the terrestrial atmosphere demands reliable information about the atmosphere condition. The aerosol lidars for operational monitoring of the atmosphere allow us to define remotely characteristics of atmospheric aerosol and cloudy formations in the atmosphere.Today the majority of aerosol lidars run in the visible range. However, in terms of safety (first of all to eyes also ultra-violet (UF range is of interest. A range of the wavelengths of the harmful effect on the eye retina is from 0.38 to 1.4 mμ. Laser radiation with the wavelengths less than 0.38 mμ and over 1.4 mμ influences the anterior ambient of an eye and is safer, than laser radiation with the wavelengths of 0.38 – 1.4 mμ.The paper describes a laser meter to measure characteristics of atmospheric inhomogeneity propertis in UF spectral range at the wavelength of 0.355 mμ.As a radiation source, the meter uses a semiconductor-pumped pulse solid-state Nd:YAG laser. As a receiving lens, Kassegren's scheme-implemented mirror lens with a socket to connect optical fibre is used in the laser meter. Radiation from the receiving lens is transported through the optical fibre to the optical block. The optical block provides spectral selection of useful signal and conversion of optical radiation into electric signal.To ensure a possibility for alignment of the optical axes of receiving lens and laser radiator the lens is set on the alignment platform that enables changing lens inclination and turn with respect to the laser.The software of the laser meter model is developed in the NI LabVIEW 2012 graphic programming environment.The paper gives the following examples: a typical laser echo signal, which is back scattered by the atmosphere and spatiotemporal distribution of variation coefficient of the volumetric factor of the back scattered atmosphere. Results of multi-day measurements show that an extent of the recorded aerosol

  15. Corneal morphology after ex-vivo UV and mid-infrared laser ablation

    Science.gov (United States)

    Spyratou, E.; Voloudakis, G. E.; Moutsouris, K.; Asproudis, I.; Baltatzis, S.; Makropoulou, M.; Bacharis, C.; Serafetinides, A. A.

    2008-12-01

    In this work, ablation experiments of ex vivo porcine cornea tissue were conducted with two solid state lasers (an Er:YAG laser and the 4th harmonic of an Nd:YAG laser, both in the ns pulse width range) emitting in mid infrared and ultraviolet part of the spectrum respectively, at moderate laser fluences. The cornea epithelium of each porcine eye was manually removed before the ablation. Histology analysis of the specimens was performed, in order to examine the microscopic appearance of the ablated craters and the existence of any thermal or mechanical damage caused by the midinfrared and the UV laser irradiation. For a detailed and complete examination of the morphology of the laser ablated corneal tissue, the surface roughness was investigated by scanning electron microscopy.

  16. Rapid prototyping of polymeric microstructures with a UV laser

    DEFF Research Database (Denmark)

    Jensen, Martin F.; McCormack, John E.; Helbo, Bjarne

    2003-01-01

    By laser ablation of Poly-Ether-Ether-Ketone (PEEK), a negative master of the microsystem was produced. This master is then used for hot embossing of a number of polystyrene (PS) parts. A few hundred replications can be made without warping and alteration of the dimensions. The possibility of using...... ion implantation of the master tool to prolong the lifetime has also been investigated. For injection moulding, where the pressure and temperature is higher than in hot embossing a positive laser ablated Acrylonitrile-butadien-styrene co-polymer (ABS) structure was used, which subsequently has been...

  17. Comparison of femtosecond laser and continuous wave UV sources for protein-nucleic acid crosslinking.

    Science.gov (United States)

    Fecko, Christopher J; Munson, Katherine M; Saunders, Abbie; Sun, Guangxing; Begley, Tadhg P; Lis, John T; Webb, Watt W

    2007-01-01

    Crosslinking proteins to the nucleic acids they bind affords stable access to otherwise transient regulatory interactions. Photochemical crosslinking provides an attractive alternative to formaldehyde-based protocols, but irradiation with conventional UV sources typically yields inadequate product amounts. Crosslinking with pulsed UV lasers has been heralded as a revolutionary technique to increase photochemical yield, but this method had only been tested on a few protein-nucleic acid complexes. To test the generality of the yield enhancement, we have investigated the benefits of using approximately 150 fs UV pulses to crosslink TATA-binding protein, glucocorticoid receptor and heat shock factor to oligonucleotides in vitro. For these proteins, we find that the quantum yields (and saturating yields) for forming crosslinks using the high-peak intensity femtosecond laser do not improve on those obtained with low-intensity continuous wave (CW) UV sources. The photodamage to the oligonucleotides and proteins also has comparable quantum yields. Measurements of the photochemical reaction yields of several small molecules selected to model the crosslinking reactions also exhibit nearly linear dependences on UV intensity instead of the previously predicted quadratic dependence. Unfortunately, these results disprove earlier assertions that femtosecond pulsed laser sources provide significant advantages over CW radiation for protein-nucleic acid crosslinking.

  18. Ultrafast pre-breakdown dynamics in Al₂O₃SiO₂ reflector by femtosecond UV laser spectroscopy.

    Science.gov (United States)

    Du, Juan; Li, Zehan; Xue, Bing; Kobayashi, Takayoshi; Han, Dongjia; Zhao, Yuanan; Leng, Yuxin

    2015-06-29

    Ultrafast carrier dynamics in Al2O3/SiO2 high reflectors has been investigated by UV femtosecond laser. It is identified by laser spectroscopy that, the carrier dynamics contributed from the front few layers of Al2O3 play a dominating role in the initial laser-induced damage of the UV reflector. Time-resolved reflection decrease after the UV excitation is observed, and conduction electrons is found to relaxed to a mid-gap defect state locating about one photon below the conduction band . To interpret the laser induced carrier dynamics further, a theoretical model including electrons relaxation to a mid-gap state is built, and agrees very well with the experimental results.. To the best of our knowledge, this is the first study on the pre-damage dynamics in UV high reflector induced by femtosecond UV laser.

  19. On harmonic operation of Shanghai deep UV free electron laser

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    By choosing parameters in the modulator,the dispersive section and the seed laser,the spatial bunching of the electron beam can be correlated to then-th harmonic of ther adiator radiation,instead of the fundamental radiation in conventional high-gain harmonic generation(HGHG).Thus,the radiator undulator is operated at high harmonic mode.In this paper,the possibility of harmonic operation of Shanghai deep ultraviolet(SDUV)free electron laser (FEL)is studied.Discussions on the principle of harmonic operation,the simulation code development,the simulation results.and the proposed experimental procedure for verification of harmonic operation at the SDUV FEL are also presented.

  20. Rapid prototyping of polymeric microstructures with a UV laser

    DEFF Research Database (Denmark)

    Jensen, Martin F.; McCormack, John E.; Helbo, Bjarne

    2003-01-01

    ion implantation of the master tool to prolong the lifetime has also been investigated. For injection moulding, where the pressure and temperature is higher than in hot embossing a positive laser ablated Acrylonitrile-butadien-styrene co-polymer (ABS) structure was used, which subsequently has been...... electroplated to achieve a negative metal mould insert. The preliminary results have been encouraging. The total time from concept to realisation of a series of prototypes is 4-5 working days....

  1. Ablation from metals induced by visible and UV laser irradiation

    DEFF Research Database (Denmark)

    Svendsen, Winnie Edith; Schou, Jørgen; Thestrup Nielsen, Birgitte

    1996-01-01

    The deposition rate of laser-ablated silver has been determined for fluences between 0.5 and 15 J/cm2 at the wavelengths 532 and 355 nm for a beam spot area of around 0.01 cm2. The ablated metal was collected on a quartz crystal microbalance. The rate at 5 J/cm2 was about 4 × 1013 Ag/cm2 per puls...

  2. Compact and portable multiline UV and visible Raman lasers in hydrogen-filled HC-PCF.

    Science.gov (United States)

    Wang, Y Y; Couny, F; Light, P S; Mangan, B J; Benabid, F

    2010-04-15

    We report on the realization of compact UV visible multiline Raman lasers based on two types of hydrogen-filled hollow-core photonic crystal fiber. The first, with a large pitch Kagome lattice structure, offers a broad spectral coverage from near IR through to the much sought after yellow, deep-blue and UV, whereas the other, based on photonic bandgap guidance, presents a pump conversion concentrated in the visible region. The high Raman efficiency achieved through these fibers allows for compact, portable diode-pumped solid-state lasers to be used as pumps. Each discrete component of this laser system exhibits a spectral density several orders of magnitude larger than what is achieved with supercontinuum sources and a narrow linewidth, making it an ideal candidate for forensics and biomedical applications.

  3. UV laser with an acousto-optic intra-cavity control for GaN-sapphire cut

    Science.gov (United States)

    Gradoboev, Yury G.; Kazaryan, Mishik A.; Mokrushin, Yury M.; Shakin, Oleg V.

    2012-09-01

    A copper vapor laser is proposed as the basic component of the installation for processing of sapphire substrates with a GaN-coating. Laser radiation is transformed to UV range by optical frequency doubling. Powerful UV lasers are prospective tools for crystal cutting, photolithography and recording of the fiber Bragg gratings. The proposed approach is more promising in comparison with the use of excimer radiation because of instabilities of excimer laser generation and low coherence of its radiation, which makes difficult precise focusing and using interference pattern of UV radiation for exposing materials. UV laser based on second harmonic radiation of copper vapors laser has been designed. The UV laser system of high operation stability has been developed with output power 1 W at wavelengths 255.5 nm, 271.1 nm, 289.1 nm and coherence length radiation about 4 cm. The original intra-cavity acousto-optic control of output radiation is developed. It is allows adjusting frequency and on-off time ratio of output laser pulses with high accuracy. The stable heat regime was achieved for an active element of copper vapor laser̤ The laser system allows to select an optimum mode of ultra-violet radiation exposition for production of different optical elements. Intra-cavity acousto-optic cell was used for controlling of single pulse amplitude and number of pulses without any power supply tuning providing the stable operation of the laser system.

  4. SOAR Adaptive Module (SAM): Seeing Improvement with a UV Laser

    Science.gov (United States)

    Tokovinin, Andrei; Cantarutti, Rolando; Tighe, Roberto; Schurter, Patricio; Martinez, Manuel; Thomas, Sandrine; van der Bliek, Nicole

    2016-12-01

    The adaptive module of the 4.1 m SOAR telescope, SOAR Adaptive Module (SAM), corrects ground-layer turbulence using an ultraviolet laser guide star. It has been commissioned in 2013 and it is in regular science operation since 2014. SAM works with the CCD imager covering a 3‧ field or with the speckle camera. It operates routinely and stably, delivering resolution in the I band equal to the free-atmosphere seeing. This paper describes the SAM system as a whole, providing essential reference for its users and technical information of interest to instrumentalists. Operation of the instrument, its performance, and science projects done with SAM so far are reviewed.

  5. Pulsed UV laser light on Escherichia coli and Saccharomyces cerevisiae suspended in non-alcoholic beer

    Directory of Open Access Journals (Sweden)

    A Elikaei

    2011-05-01

    Full Text Available Background: The aim of this study was to investigate the effect of pulsed ultra-violet (UV irradiation on inactivation of beer spoilage microorganisms. UV irradiation is nowadays cost effective enough to compete with traditional biological, physical, and chemical treatment technologies and has become an alternative to such methods."nMaterial and Methods: Photoinactivation effects of pulsed UV laser with the wavelengths of 355 and 266 nm, which inactivate typical prokaryotic (Escherichia coli and eukaryotic (Saccharomyces cerevisiae microorganisms, were examined with different doses and exposure times."nResults: A dose of 100 J/cm2 of the 355 nm pulsed UV laser was able to reduce about 1 to 2 log (88.75% of E.coli with the population of 1.6×108 colony-forming units (CFU/ml, and 97% of 3.2×107, 3×106, 5.5×105, and 9×104 CFU/ml. In the case of 266 nm, more than 99% reduction in E. coli serial dilutions was inactivated, using 10 J/cm2 with exception of 7×104 CFU/ml which was not detected any bacterial growth using 5 J/cm2. In addition, 50, 40, and 20 J/cm2 energy were used successfully to inactivate S. cerevisiae at the populations of 5.4×106, 7×105, 5×104 and 4×103 CFU/ml, respectively."nAs a result, pulsed UV Laser with 266 nm was strong enough to inactivate a high titer of bacterial and yeast indicator standards suspended in non-alcoholic beer in comparison with 355nm doses."nConclusion: Results indicate that pulsed UV technology, in principle, is an attractive alternative to conventional methods for the inactivation of indicator microorganisms and has potential in irradiation of unpasteurized beer.

  6. Pulsed UV laser light on Escherichia coli and Saccharomyces cerevisiae suspended in non-alcoholic beer

    Science.gov (United States)

    Hosseini, SM; Azar-Daryany, MK; Massudi, R; Elikaei, A

    2011-01-01

    Background The aim of this study was to investigate the effect of pulsed ultra-violet (UV) irradiation on inactivation of beer spoilage microorganisms. UV irradiation is nowadays cost effective enough to compete with traditional biological, physical, and chemical treatment technologies and has become an alternative to such methods. Material and Methods Photoinactivation effects of pulsed UV laser with the wavelengths of 355 and 266 nm, which inactivate typical prokaryotic (Escherichia coli) and eukaryotic (Saccharomyces cerevisiae) microorganisms, were examined with different doses and exposure times. Results A dose of 100 J/cm2 of the 355 nm pulsed UV laser was able to reduce about 1 to 2 log (88.75%) of E.coli with the population of 1.6×108 colony-forming units (CFU/ml), and 97% of 3.2×107, 3×106, 5.5×105, and 9×104 CFU/ml. In the case of 266 nm, more than 99% reduction in E. coli serial dilutions was inactivated, using 10 J/cm2 with exception of 7×104 CFU/ml which was not detected any bacterial growth using 5 J/cm2. In addition, 50, 40, and 20 J/cm2 energy were used successfully to inactivate S. cerevisiae at the populations of 5.4×106, 7×105, 5×104 and 4×103 CFU/ml, respectively. As a result, pulsed UV Laser with 266 nm was strong enough to inactivate a high titer of bacterial and yeast indicator standards suspended in non-alcoholic beer in comparison with 355nm doses. Conclusion Results indicate that pulsed UV technology, in principle, is an attractive alternative to conventional methods for the inactivation of indicator microorganisms and has potential in irradiation of unpasteurized beer. PMID:22347580

  7. Raman study of TiO2 coatings modified by UV pulsed laser

    Science.gov (United States)

    Belka, Radosław; Keczkowska, Justyna; Sek, Piotr

    2016-12-01

    The TiO2 coatings were prepared by simple sol-gel method and modified by UV pulsed laser. TiO2, also know as titania, is a ceramic compound, existing in numerous polymorphic forms, mainly as tetragonal rutile and anatase, and rhomboidal brookite. Rutile is the most stable form of titanium dioxide, whereas anatase is a metastable form, created in lower temperatures than rutile. Anatase is marked with higher specific surface area, porosity and a higher number of surface hydroxyl groups as compared to rutile. The unique optical and electronic properties of TiO2 results in its use as semiconductors dielectric mirrors, sunscreen and UV-blocking pigments and especially as photocatalyst. In this paper, the tetraisopropoxide was used as Ti precursor according to sol-gel method. An organic base was applied during sol preparation. Prepared gel was coated on glass substrates and calcined in low temperature to obtain amorphous phase of titania. Prepared coatings were modified by UV picosecond pulse laser with different pulse repetition rate and pulse power. Physical modification of the coatings using laser pulses was intended in order change the phase content of the produced material. Raman spectroscopy (RS) method was applied to studies of modified coatings as it is one of the basic analytical techniques, supporting the identification of compounds and obtaining information about the structure. Especially, RS is a useful method for distinguishing the anatase and rutile phases. In these studies, anatase to rutile transformation was observed, depending on laser parameters.

  8. Measurement of UV absorption of single living cell for cell manipulation using NIR femtosecond laser

    Energy Technology Data Exchange (ETDEWEB)

    Cho, Sung-Hak, E-mail: shcho@kimm.re.kr [Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Material), 171 Jang-dong, Yuseong-Gu, Daejeon 305-343 (Korea, Republic of); Materials Research and Education Center, Department of Mechanical Engineering, Auburn University, 275 Wilmore Laboratories, Auburn University, Auburn, AL 36849 (United States); Chang, Won-Seok [Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Material), 171 Jang-dong, Yuseong-Gu, Daejeon 305-343 (Korea, Republic of); Kim, Kwang-Ryul [Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Hong, Jong Wook [Materials Research and Education Center, Department of Mechanical Engineering, Auburn University, 275 Wilmore Laboratories, Auburn University, Auburn, AL 36849 (United States)

    2009-02-15

    Optical UV absorption of single human living cells ranging from 200 nm to 360 nm was measured in situ for the study of cell manipulation using the near-infrared (NIR) femtosecond laser. Human breast living cells of MCF-10A, MCF-7, and MDA-MB-231 were used in this experiment. The selective photo-disruptions of single living cell and its sub-organelle (nucleus) were also demonstrated using the tightly focused 790 nm wavelength femtosecond laser with pulse duration of 110 fs. It was found that each living cell has its own absorption spectrum in UV wavelength ranges. It was also inferred that intrinsic absorption spectrum is attributed to the amount of DNA and protein of living cell. For the study of photo-disruption of single cell using the multi-photon absorption excited by the NIR femtosecond laser pulse, the origin UV absorption spectrum of targeted living cell is important and fundamental information to understand nonlinear interaction between NIR ultrashort, high-intensity laser light and transparent living cell.

  9. High energy, high average power solid state green or UV laser

    Science.gov (United States)

    Hackel, Lloyd A.; Norton, Mary; Dane, C. Brent

    2004-03-02

    A system for producing a green or UV output beam for illuminating a large area with relatively high beam fluence. A Nd:glass laser produces a near-infrared output by means of an oscillator that generates a high quality but low power output and then multi-pass through and amplification in a zig-zag slab amplifier and wavefront correction in a phase conjugator at the midway point of the multi-pass amplification. The green or UV output is generated by means of conversion crystals that follow final propagation through the zig-zag slab amplifier.

  10. Absorptions UV dans le fonctionnement des sources lasers solides à ions de terres rares

    Science.gov (United States)

    Moncorgé, R.; Margerie, J.; Doualan, J. L.; Nagtegaele, P.; Guyot, Y.

    2006-12-01

    L'article donne une description et analyse les phénomènes d'absorption UV à l'origine des mécanismes de solarisation et de variation d'indice de réfraction observés dans certains matériaux dopés terres rares étudiés pour leurs propriétés laser UV ou infrarouge lorsqu'ils sont soumis à de fortes densités d'excitation optique.

  11. H(II) centers in natural silica under repeated UV laser irradiations

    OpenAIRE

    Messina, F.; Cannas, M.; Boscaino, R.

    2004-01-01

    We investigated the kinetics of H(II) centers (=Ge'-H) in natural silica under repeated 266nm UV irradiations performed by a Nd:YAG pulsed laser. UV photons temporarily destroy these paramagnetic defects, their reduction being complete within 250 pulses. After re-irradiation, H(II) centers grow again, and the observed recovery kinetics depends on the irradiation dose; multiple 2000 pulses re-irradiations induce the same post-irradiation kinetics of H(II) centers after each exposure cycle. The...

  12. Low-cost laser printable photomask: One-step, photoresist-free, fully solution processed high-grade photolithography mask

    Science.gov (United States)

    Yun, Jinho; Kim, Jongsu; Yang, Minyang; Kang, Bongchul

    2017-02-01

    Owing to the short life cycle of present-day microelectronics, conventional method of photomask fabrication should be replaced in order to improve the resultant agility and productivity of photolithography. To fulfill these requirements, we suggest a fully solution-based one-step fabrication method of a high-grade photomask, without the use of a photoresist, vacuum deposition, and etching process. The photomask is fabricated via the laser-induced instantaneous thermochemical metallization of an optically catalyzed hybrid complex synthesized in-situ from a low-cost particle-free organometallic solution. This reaction yields a masking layer whose high selectivity of less than 1 μm, self-generated retroreflective structure, and excellent optical surface are comparable to those of masks fabricated by vacuum depositions. In addition, the complexity of the process is minimized owing to the solution deposition of all the constituent layers. A series of evaluations and the application of this method to an actual photolithography process confirm that this approach constitute a next-generation photomask fabrication method by satisfying both improved agility and productivity of microelectronics manufacturing.

  13. NANOSCALE STRUCTURES GENERATION WITHIN THE SURFACE LAYER OF METALS WITH SHORT UV LASER PULSES

    Directory of Open Access Journals (Sweden)

    Dmitry S. Ivanov

    2017-01-01

    Full Text Available We have completed modeling of a laser pulse influence on a gold target. We have applied a hybrid atomistic-continuum model to analyze the physical mechanisms responsible for the process of nanostructuring. The model combines the advantages of Molecular Dynamics and Two Temperature Model. We have carried out a direct comparison of the modeling results and experimental data on nano-modification due to a single ps laser pulse at the energy densities significantly exceeding the melting threshold. The experimental data is obtained due to a laser pulse irradiation at the wavelength of 248 nm and duration of 1.6 ps. The mask projection (diffraction grating creates the sinusoidal intensity distribution on a gold surface with periods of 270 nm, 350 nm, and 500 nm. The experimental data and modeling results have demonstrated a good match subject to complex interrelations between a fast material response to the laser excitation, generation of crystal defects, phase transitions and hydrodynamic motion of matter under condition of strong laser-induced non-equilibrium. The performed work confirms the proposed approach as a powerful tool for revealing the physical mechanisms underlying the process of nanostructuring of metal surfaces. Detailed understanding of the dynamics of these processes gives the possibility for designing the topology of functional surfaces on nano- and micro-scales.

  14. UV laser approach to doppler tropospheric wind sounding from a satellite

    Science.gov (United States)

    McKay, Jack A.; Wilkerson, Thomas D.; Heller, Donald F.; Walling, John C.

    1995-12-01

    The possibility of direct detection of tropospheric wind speed Doppler shift with an ultraviolet laser is considered. The use of the UV eliminates all practical concerns of eye safety, permits the use of uncooled detectors, and yields enhanced aerosol and Rayleigh backscatter signals. The Rayleigh signal, which in the free troposphere can exceed the aerosol signal by three orders of magnitude, is itself a candidate for wind speed measurement, despite the Doppler broadening of this signal. The basis of this approach is a diode-pumped, frequency-doubled alexandrite laser, which offers very high electrical to optical energy efficiency, an estimated 9%, in generating UV output. Efficiency is critical for a satellite based lidar system due to the size, cost, and mass of solar power generation and waste heat disposal subsystems. Pumping of alexandrite with 680 nm laser diodes has been demonstrated. Narrow linewidth, high spectral purity, and high frequency stability have been obtained with laser diode injection seeding of a ring alexandrite laser. The tunable diode laser control allows tuning of the laser for spacecraft velocity compensation. The potential performance of a wind sounding lidar scaled to match the 300 W power capability of a mid-sized satellite is evaluated for the extremely weak aerosol conditions of the southern hemisphere oceans. A 20 W output laser system, with 1 m aperture telescope, at 350 km altitude, may yield measurement precisions better than plus or minus 3 m/s through most of the troposphere, deteriorating to plus or minus 10 m/s under extreme conditions. A Rayleigh backscatter system will yield plus or minus 3 m/s precision to 8 km altitude, plus or minus 5 m/s at 15 km, even with zero aerosol content.

  15. Multi-diode laser system for UV exposure of the photoresists

    Science.gov (United States)

    Barbucha, R.; Tanski, M.; Kocik, M.

    2015-06-01

    PCB (Printed Circuit Board) industry is a global business for many years. PCB can be found in every electronic devices and since it becomes smaller, lighter and more efficient, new sophisticated machines need to be developed to meet this demands. The main parameter for the manufacturing machines is throughput. In this paper a multi-diode laser system for UV exposure of the photoresist on Printed Circuit Board is presented. The multi-diode laser system presents high throughput at high resolution of the pattern as well as low development costs.

  16. Response of antioxidant defense system to laser radiation apical meristem of Isatis indigotica seedlings exposed to UV-B

    Science.gov (United States)

    2009-01-01

    To determine the response of antioxidant defense system to laser radiation apical meristem of Isatis indigotica seedlings, Isatis indigotica seedlings were subjected to UV-B radiation (10.08 kJ m−2) for 8 h day−1 for 8 days (PAR, 220 µmol m−2 s−1) and then exposed to He-Ne laser radiation (633 nm; 5.23 mW mm−2; beam diameter: 1.5 mm) for 5 min each day without ambient light radiation. Changes in free radical elimination systems were measured, the results indicate that: (1) UV-B radiation enhanced the concentration of Malondialdahyde (MDA) and decreased the activities of superoxide dismutase (SOD), catalase (CAT) and peroxidase (POD) in seedlings compared with the control. The concentration of MDA was decreased and the activities of SOD, CAT and POD were increased when seedlings were subjected to elevated UV-B damage followed by laser; (2) the concentration of UV absorbing compounds and proline were increased progressively with UV-B irradiation, laser irradiation and He-Ne laser irradiation plus UV-B irradiation compared with the control. These results suggest that laser radiation has an active function in repairing UV-B-induced lesions in seedlings. PMID:19820308

  17. Selection of a LGp0-shaped fundamental mode in a laser cavity: Phase versus amplitude masks

    CSIR Research Space (South Africa)

    Hasnaoui, A

    2012-01-01

    Full Text Available Laser beams of a single high-order transverse mode have been of interest to the laser community for several years now. In order to achieve such a mode as the fundamental mode of the cavity, mode selecting elements in the form of a phase or amplitude...

  18. IR and UV laser-induced morphological changes in silicon surface under oxygen atmosphere

    Energy Technology Data Exchange (ETDEWEB)

    Jimenez-Jarquin, J.; Fernandez-Guasti, M.; Haro-Poniatowski, E.; Hernandez-Pozos, J.L. [Laboratorio de Optica Cuantica, Departamento de Fisica, Universidad Autonoma Metropolitana-Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340, Mexico D.F. (Mexico)

    2005-08-01

    We irradiated silicon (100) wafers with IR (1064 nm) and UV (355 nm) nanosecond laser pulses with energy densities within the ablation regime and used scanning electron microscopy to analyze the morphological changes induced on the Si surface. The changes in the wafer morphology depend both on the incident radiation wavelength and the environmental atmosphere. We have patterned Si surfaces with a single focused laser spot and, in doing the experiments with IR or UV this reveals significant differences in the initial surface cracking and pattern formation, however if the experiment is carried out in O{sub 2} the final result is an array of microcones. We also employed a random scanning technique to irradiate the silicon wafer over large areas, in this case the microstructure patterns consist of a ''semi-ordered'' array of micron-sized cones. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  19. XPS investigations on the UV-laser ablation mechanism of poly(ether imide)

    Energy Technology Data Exchange (ETDEWEB)

    Wambach, J.; Kunz, T.; Schnyder, B.; Koetz, R.; Wokaun, A. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1999-08-01

    UV-Laser ablated samples of poly(ether imide) [Kapton{sup TM}] were studied with small-spot XPS. Applying fluences above the threshold level (0.167 J/cm{sup 2}) resulted in the expected behaviour of a decline of both nitrogen and oxygen. Below the threshold level a hint for an altered ablation mechanism was found. (author) 1 fig., 5 refs.

  20. Combinatorial screening of halide perovskite thin films and solar cells by mask-defined IR laser molecular beam epitaxy.

    Science.gov (United States)

    Kawashima, Kazuhiro; Okamoto, Yuji; Annayev, Orazmuhammet; Toyokura, Nobuo; Takahashi, Ryota; Lippmaa, Mikk; Itaka, Kenji; Suzuki, Yoshikazu; Matsuki, Nobuyuki; Koinuma, Hideomi

    2017-01-01

    As an extension of combinatorial molecular layer epitaxy via ablation of perovskite oxides by a pulsed excimer laser, we have developed a laser molecular beam epitaxy (MBE) system for parallel integration of nano-scaled thin films of organic-inorganic hybrid materials. A pulsed infrared (IR) semiconductor laser was adopted for thermal evaporation of organic halide (A-site: CH3NH3I) and inorganic halide (B-site: PbI2) powder targets to deposit repeated A/B bilayer films where the thickness of each layer was controlled on molecular layer scale by programming the evaporation IR laser pulse number, length, or power. The layer thickness was monitored with an in situ quartz crystal microbalance and calibrated against ex situ stylus profilometer measurements. A computer-controlled movable mask system enabled the deposition of combinatorial thin film libraries, where each library contains a vertically homogeneous film with spatially programmable A- and B-layer thicknesses. On the composition gradient film, a hole transport Spiro-OMeTAD layer was spin-coated and dried followed by the vacuum evaporation of Ag electrodes to form the solar cell. The preliminary cell performance was evaluated by measuring I-V characteristics at seven different positions on the 12.5 mm × 12.5 mm combinatorial library sample with seven 2 mm × 4 mm slits under a solar simulator irradiation. The combinatorial solar cell library clearly demonstrated that the energy conversion efficiency sharply changes from nearly zero to 10.2% as a function of the illumination area in the library. The exploration of deposition parameters for obtaining optimum performance could thus be greatly accelerated. Since the thickness ratio of PbI2 and CH3NH3I can be freely chosen along the shadow mask movement, these experiments show the potential of this system for high-throughput screening of optimum chemical composition in the binary film library and application to halide perovskite solar cell.

  1. Edge isolation of transparent conductive polymer (TCP) thin films on flexible substrates using UV laser ablation.

    Science.gov (United States)

    Hsiao, Wen-Tse; Tseng, Shih-Feng; Huang, Kuo-Cheng; Chiang, Donyau; Chen, Ming-Fei

    2012-06-01

    The purpose of this study was to directly use the writing techniques for the complex electrode edge isolation of transparent conductive polymer (TCP) thin films by a nanosecond pulsed UV laser processing system. The processing parameters including the laser pulse energy, the pulse repetition frequency, and the scan speed of galvanometers were examined to ablate the TCP films deposited on polyethylene terephtalate substrates of 188 microm thick. The thickness of TCP films was approximately 20 nm. The laser pulse repetition frequency and the scan speed of galvanometers were applied to calculate the overlapping rate of laser spots and to discuss the patterning region quality. Surface morphology, edge quality, and width and depth of edge isolated patterning structures after laser ablation process were measured by a three-dimensional confocal laser scanning microscope. In addition, the electrical conductivity of ablated TCP films was measured by a four-point probes instrument. After isolated line patterning was formed, the ablated TCP films with a better edge quality were obtained directly when the overlapping rate of laser spots, the scan speed, and the pulse repetition rate were 83.3%, 200 mm/s, and 40 kHz, respectively. The better surface morphology of electrode pattern structures was also obtained when the scan speed and the pulse repetition rate were 500 mm/s and 40 kHz, respectively.

  2. A study on micro hydroforming using shock wave of 355 nm UV-pulsed laser

    Science.gov (United States)

    Je, Gyeongju; Malka, Dror; Kim, Hyesu; Hong, Sungmoo; Shin, Bosung

    2017-09-01

    In this paper, we proposed a new manufacturing technology of micro hydroforming using 355 nm ultraviolet(UV)-pulsed laser. Hydroforming is known as a well-established technology to manufacture metallic parts, in particular for mass production of sheet metal, for several industrial applications such as automobiles, battery and military products. In addition laser shock processing(LSP) has been developed as the expanded applications of electrical and mechatronic devices. When the material was exposed to laser beam, multiple phenomena like the photochemical, the photothermal and the photomechanical effect are simultaneously occurred at the spot area. Especially, the photothermal effect due to laser heat transfer makes it hard to improve the accuracy of laser processing. To reduce the thermal effect and to enhance the photomechanical effect, the laser was irradiated under water in this paper. Strong forming pressure of LSP was provided by the higher density of water than air, which could help directly manufacture the thin sheet metal materials like as laser direct writing. We also conducted computer simulation using finite element method(FEM) to demonstrate its deformation behaviour with and without the strain rate effect of 104-105 (sec-1). Compared with conventional processing technology, this new method can provide high selectivity, excellent hydroforming efficiency and lower cost to achieve micro grooving pattern on the surface of thin metal sheet.

  3. Single-mode solid-state polymer dye laser fabricated with standard I-line UV lithography

    DEFF Research Database (Denmark)

    Balslev, Søren; Mironov, Andrej; Nilsson, Daniel

    2005-01-01

    We present single-mode solid-state polymer dye lasers fabricated with standard UV lithography. The lasers use a high-order Bragg grating and rely on index-tuning of a photosensitive polymer for waveguiding. The gain medium is Rhodamine 6G.......We present single-mode solid-state polymer dye lasers fabricated with standard UV lithography. The lasers use a high-order Bragg grating and rely on index-tuning of a photosensitive polymer for waveguiding. The gain medium is Rhodamine 6G....

  4. Low cost, patterning of human hNT brain cells on parylene-C with UV & IR laser machining.

    Science.gov (United States)

    Raos, Brad J; Unsworth, C P; Costa, J L; Rohde, C A; Doyle, C S; Delivopoulos, E; Murray, A F; Dickinson, M E; Simpson, M C; Graham, E S; Bunting, A S

    2013-01-01

    This paper describes the use of 800nm femtosecond infrared (IR) and 248nm nanosecond ultraviolet (UV) laser radiation in performing ablative micromachining of parylene-C on SiO2 substrates for the patterning of human hNT astrocytes. Results are presented that support the validity of using IR laser ablative micromachining for patterning human hNT astrocytes cells while UV laser radiation produces photo-oxidation of the parylene-C and destroys cell patterning. The findings demonstrate how IR laser ablative micromachining of parylene-C on SiO2 substrates can offer a low cost, accessible alternative for rapid prototyping, high yield cell patterning.

  5. Laser cleaning of the metallic thin films from silicon wafer surface with UV laser radiation

    Science.gov (United States)

    Apostol, Ileana; Apostol, Dan; Victor, Damian; Timcu, Adrian; Iordache, Iuliana; Castex, Marie-Claude C.; Galli, Roberta; Ulieru, Dumitru G.

    2004-10-01

    The interest to use laser surface processing in microtechnology as a friendly method from the technologic and environmental point of view lead our studies about laser radiation interaction with photo-resist and metallic thin films. In this view we have tried in our experiments to process metallic thin films deposited on silicon substrate by using laser radiation. To obtain a good quality of the metallic thin film removal from the silicon surface a careful selection of the incident laser intensity, number of pulses and irradiation geometry is needed. The threshold value for the laser cleaning intensity depends on the number of incident laser pulses. A careful experimental estimation of the cleaning conditions from the point of view of incident laser energy, fluence, intensity and irradiation geometry was realized for aluminum, copper, and chromium thin films.

  6. UV–UV hole burning and IR dip spectroscopy of homophenylalanine by laser desorption supersonic jet technique

    Energy Technology Data Exchange (ETDEWEB)

    Sohn, Woon Yong; Ishiuchi, Shun-ichi [Chemical Resources Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan); Çarçabal, Pierre [Institut des Sciences Moléculaires d’Orsay, CNRS, Université Paris Sud XI, Bâtiment 210, 91405 Orsay (France); Oba, Hikari [Chemical Resources Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan); Fujii, Masaaki, E-mail: mfujii@res.titech.ac.jp [Chemical Resources Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan)

    2014-12-05

    Highlights: • Homophenylalanine was measured by laser desorption supersonic jet spectroscopy. • Ten conformers were found by UV–UV hole burning spectroscopy. • The observed conformers were assigned by the combination of UV and IR spectra. • Franck–Condon simulations were employed to assign the flexible molecule. - Abstract: Conformer selected electronic and vibrational spectra of homophenylalanine, phenylalanine analogue molecule, were measured by UV–UV hole burning and IR dip spectroscopy combined with laser desorption technique. 10 conformers were found by UV–UV hole burning spectroscopy and their structures were assigned by IR dip and UV absorption spectra with aid of quantum chemical calculations in both S{sub 0} and S{sub 1}. This study shows that the combination of simulated IR and UV spectra is powerful to assign flexible molecules.

  7. Production of High Intracavity UV Power From a CW Laser Source

    Science.gov (United States)

    David, R. T.; Chyba, T. H.; Keppel, C. E.; Gaskell, D.; Ent, R.

    1998-01-01

    The goal of this research project is to create a prototype high power CW source of ultraviolet (UV) photons for photon-electron scattering at the Thomas Jefferson National Accelerator Facility (TJNAF), Hall B. The facility will use optical resonant cavities to produce a high photon flux. The technical approach will be to frequency-double the 514.5 mn light from an Argon-Ion Laser to create 0.1 to 1.0 watt in the UV. The produced UV power will be stored in a resonant cavity to generate an high intracavity UV power of 102 to 103 watts. The specific aim of this project is to first design and construct the low-Q doubling cavity and lock it to the Argon-Ion wavelength. Secondly, the existing 514.5 nm high-Q build-up cavity and its locking electronics will be modified to create high intracavity UV power. The entire system will then be characterized and evaluated for possible beam line use.

  8. Improved patterning of ITO coated with gold masking layer on glass substrate using nanosecond fiber laser and etching

    Energy Technology Data Exchange (ETDEWEB)

    Tan, Nguyen Ngoc; Hung, Duong Thanh; Anh, Vo Tran [High Safety Vehicle Core Technology Research Center, Department of Mechanical & Automotive Engineering, Inje University, Gimhae (Korea, Republic of); BongChul, Kang, E-mail: kbc@kumoh.ac.kr [Department of Inteligent Mechanical Engineering, Kumoh National Institute of Technology, Gumi (Korea, Republic of); HyunChul, Kim, E-mail: mechkhc@inje.ac.kr [High Safety Vehicle Core Technology Research Center, Department of Mechanical & Automotive Engineering, Inje University, Gimhae (Korea, Republic of)

    2015-05-01

    Highlights: • A new patterning method for ITO thin film is introduced. • Gold thin film is important in decrease spikes formed in ITO patterning process. • The laser pulse width occupies a significant effect the patterning surface quality. • Etching process is the effective method to remove the spikes at rims of pattern. • A considerable improvement over patterning quality is obtained by proposed method. - Abstract: In this paper, an indium–tin oxide (ITO) thin-film patterning method for higher pattern quality and productivity compared to the short-pulsed laser direct writing method is presented. We sputtered a thin ITO layer on a glass substrate, and then, plated a thin gold layer onto the ITO layer. The combined structure of the three layers (glass–ITO–gold) was patterned using laser-induced plasma generated by an ytterbium pulsed fiber laser (λ = 1064 nm). The results showed that the process parameters of 50 mm/s in scanning speed, 14 ns pulse duration, and a repetition rate of 7.5 kHz represented optimum conditions for the fabrication of ITO channels. Under these conditions, a channel 23.4 μm wide and 20 nm deep was obtained. However, built-up spikes (∼15 nm in height) resulted in a decrease in channel quality, and consequently, short circuit occurred at some patterned positions. These built-up spikes were completely removed by dipping the ITO layer into an etchant (18 wt.% HCl). A gold masking layer on the ITO surface was found to increase the channel surface quality without any decrease in ITO thickness. Moreover, the effects of repetition rate, scanning speed, and etching characteristics on surface quality were investigated.

  9. Kerr self-defocusing of multiple filaments in TW peak power UV laser beam

    Science.gov (United States)

    Zvorykin, V. D.; Goncharov, S. A.; Ionin, A. A.; Mokrousova, D. V.; Ryabchuk, S. V.; Seleznev, L. V.; Shutov, A. V.; Smetanin, I. V.; Sunchugasheva, E. S.; Ustinovskii, N. N.

    2016-12-01

    An effective suppression of multiple filamentation of the sub-TW peak power supercritical laser beam in xenon gas was demonstrated in direct amplification of subpicosecond UV pulses at Ti:sapphire/KrF laser facility GARPUN-MTW. A large negative nonlinear refractive index due to a two-photon resonance of KrF laser radiation with Xe 6p{{≤ft[1/2\\right]}0} state ensured Kerr self-defocusing of a few hundred filaments with a local peak intensity of ~0.2 TW cm-2, 200-fold higher than the average one over the beam cross section, and thus homogenized the laser beam. UV filaments in Xe produced a narrow-angle monochromatic coherent cone emission at 828 nm wavelength due to stimulated hyper-Raman scattering and amplified spontaneous emission at the transition 6p{{≤ft[1/2\\right]}0}\\to 6s≤ft[3/2\\right]10 .

  10. Discharge processes of UV pre-ionized electric-discharge pulsed DF laser

    Science.gov (United States)

    Pan, Qikun; Xie, Jijiang; Shao, Chunlei; Wang, Chunrui; Shao, Mingzhen; Guo, Jin

    2016-03-01

    The discharge processes of ultraviolet (UV) pre-ionized electric-discharge pulsed DF laser operating with a SF6-D2 gas mixture are studied. A mathematical model based on continuity equation of electrons and Kirchhoff equations for discharge circuit is established to describe the discharge processes. Voltage and current waveforms of main discharge and voltage waveforms of pre-ionization are solved numerically utilizing the model. The calculations correctly display some physical processes, such as the delay time between pre-ionization and main discharge, breakdown of the main electrode and self-sustained volume discharge (SSVD). The results of theory are consistent with the experiments, which are performed in our non-chain pulsed DF laser. Then the delay inductance and peak capacitance are researched to analyze their influences on discharge processes, and the circuit parameters of DF laser are given which is useful to improve the discharge stability.

  11. Prospects and merits of metal-clad semiconductor lasers from nearly UV to far IR

    CERN Document Server

    Khurgin, Jacob B

    2015-01-01

    Using metal-clad (or plasmonic) waveguide structures in semiconductor lasers carries a promise of reduced size, threshold, and power consumption. This promise is put to a rigorous theoretical test, that takes into account increased waveguide loss, Auger recombination, and Purcell enhancement of spontaneous recombination. The conclusion is that purported benefits of metal waveguides are small to nonexistent for all the band-to-band and intersubband lasers operating from UV to Mid-IR range, with a prominent exception of far-IR and THz quantum cascade lasers. For these devices, however, metal waveguides already represent the state of the art, and the guiding mechanism in them has far more in common with a ubiquitous transmission line than with plasmonics.

  12. A novel polishing technology for epoxy resin based on 355 nm UV laser

    Science.gov (United States)

    Meng, Xinling; Tao, Luqi; Liu, Zhaolin; Yang, Yi; Ren, Tianling

    2017-06-01

    The electromagnetic shielding film has drawn much attention due to its wide applications in the integrated circuit package, which demands a high surface quality of epoxy resin. However, gaseous Cu will splash and adhere to epoxy resin surface when the Cu layer in PCB receives enough energy in the process of laser cutting, which has a negative effect on the quality of the shielding film. Laser polishing technology can solve this problem and it can effectively improve the quality of epoxy resin surface. The paper studies the mechanism of Cu powder spraying on the compound surface by 355 nm ultraviolet (UV) laser, including the parameters of laser polishing process and the remains of Cu content on compound surface. The results show that minimal Cu content can be realized with a scanning speed of 700 mm/s, a laser frequency of 50 kHz and the distance between laser focus and product top surface of -1.3 mm. This result is important to obtain an epoxy resin surface with high quality. Project supported by the National Natural Science Foundation of China (Nos. 61574083, 61434001), the National Basic Research Program (No. 2015CB352100), the National Key Project of Science and Technology (No. 2011ZX02403-002), the Special Fund for Agroscientic Research in the Public Interest of China (No 201303107), the support of the Independent Research Program of Tsinghua University (No. 2014Z01006), and Advanced Sensor and Integrated System Lab of Tsinghua University Graduate School at Shenzhen (No. ZDSYS20140509172959969).

  13. Mask degradation monitoring with aerial mask inspector

    Science.gov (United States)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  14. Laser-induced breakdown spectroscopy for on-line control of selective removal of cobalt binder from tungsten carbide hardmetal by pulsed UV laser surface ablation

    Science.gov (United States)

    Li, Tiejun; Lou, Qihong; Wei, Yunrong; Huang, Feng; Dong, Jingxing; Liu, Jingru

    2001-09-01

    Laser-induced breakdown spectroscopy (LIBS) was successfully used in on-line control of selective removal of cobalt from tungsten carbide hardmetal by pulsed UV laser surface ablation. The dependence of LIBS on number of laser shots was investigated at different laser fluences. The optimal laser fluence of 2.5 J/cm 2 suited for selective removal of cobalt from surface layer of hardmetal was confirmed. The result sample was also subject to different post-examinations to evaluate the feasibility of the application of LIBS in this laser ablation process. It was demonstrated that, monitoring of the emission intensity of cobalt lines could be used as a control parameter for selective removal of cobalt from surface layer of hardmetal by pulsed UV laser. The on-line implementation of the spectroscopic technique LIBS to the surface-ablation process provided important information about the optimal-ablation parameters.

  15. The potential for optical beam shaping of UV laser sources for mass scale quarantine disinfection applications

    Science.gov (United States)

    Lizotte, Todd

    2010-08-01

    disinfection systems using high intensity UV laser sources instead of UV bulb techniques by using laser beam shaping optics in conjunction with traditional optical laser beam delivery techniques.

  16. Photodeposited diffractive optical elements of computer generated masks

    Energy Technology Data Exchange (ETDEWEB)

    Mirchin, N. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel)]. E-mail: mirchin@hait.ac.il; Peled, A. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Baal-Zedaka, I. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Margolin, R. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Zagon, M. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Lapsker, I. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Verdyan, A. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Azoulay, J. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel)

    2005-07-30

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick.

  17. Photodeposited diffractive optical elements of computer generated masks

    Science.gov (United States)

    Mirchin, N.; Peled, A.; Baal-Zedaka, I.; Margolin, R.; Zagon, M.; Lapsker, I.; Verdyan, A.; Azoulay, J.

    2005-07-01

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick.

  18. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition

    Science.gov (United States)

    Chiu, Hsiang-Chih; Chang, Huan-Pu; Lo, Fang-Yu; Yeh, Yu-Ting; Department of Physics, National Taiwan Normal University Collaboration

    Zinc Oxide (ZnO) nanostructures have potential applications in nano-electro-mechanical systems (NEMS) due to their unique physical properties. ZnO is also an excellent lubricant and hence a promising candidate for protective coatings in NEMS. By means of atomic force microscopy (AFM), we have investigated the frictional properties of ZnO thin films prepared by pulsed laser deposition technique. In addition, UV illumination is used to convert the surface wettability of ZnO thin films from being more hydrophobic to superhydrophilic via the photo-catalyst effect. We found that the frictional properties of the UV illuminated, superhydrophilic ZnO surface are strongly dependent on the environment humidity. While for hydrophobic ZnO, no such dependence is found. The observed frictional behaviors can be explained by the interplay between the surface roughness, environmental humidity and the presence of nanoscale capillary condensation forming between surface asperities at the tip-ZnO contact. Our results might find applications in future ZnO related NEMS. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition.

  19. UV-exposed Bragg gratings for laser applications in silver-sodium ion-exchanged phosphate glass waveguides.

    Science.gov (United States)

    Yliniemi, Sanna; Albert, Jacques; Wang, Qing; Honkanen, Seppo

    2006-04-03

    High reflectivity Bragg gratings have been written by ArF excimer laser through a phase mask into IOG-1 hybrid phosphate glass. After grating exposure, a waveguide was fabricated by silver-sodium ion-exchange. Reflectivities around 80% at a wavelength of ~ 1535 nm were measured from the waveguide for both quasi-TE and -TM polarizations. Waveguide laser operation with the photowritten waveguide grating as another mirror was demonstrated. Output power of 3.8 mW with a pump power of 199 mW could be extracted from the laser configuration.

  20. Fabrication of 250-nm-hole arrays in glass and fused silica by UV laser ablation

    Science.gov (United States)

    Karstens, R.; Gödecke, A.; Prießner, A.; Ihlemann, J.

    2016-09-01

    Parallel nanohole drilling in glass using an ArF excimer laser (193 nm) is demonstrated. For the first time, hole arrays with 500 nm pitch and individual holes with 250 nm diameter and more than 100 nm depth are fabricated by phase mask imaging using a Schwarzschild objective. Holes in soda lime glass are drilled by direct ablation; fused silica is processed by depositing a SiOx-film on SiO2, patterning the SiOx by ablation, and finally oxidizing the remaining SiOx to SiO2. Thermally induced ordered dewetting of noble metal films deposited on such templates may be used for the fabrication of plasmonic devices.

  1. UV laser induced desorption of CsI and RbI ion clusters

    Science.gov (United States)

    Fernández-Lima, F. A.; Ponciano, C. R.; Filho, H. D. Fonseca; Pedrero, E.; Chaer Nascimento, M. A.; da Silveira, E. F.

    2006-09-01

    Experimental results of laser sputtering of cesium and rubidium iodide secondary ions are presented. A TOF mass spectrometer, operating in linear mode, continuous extraction for positive or negative ions, was used for the analysis of (CsI) nCs +, (CsI) nI -, (RbI) nRb + and (RbI) nI - ion emission as a function of the laser irradiance. Experimental data show that the cluster ion emission yields decrease exponentially with n, for all the laser irradiances applied. Theoretical analysis of the clusters structure was performed using density functional theory at the B3LYP/LACV3P level, for the positive and negative cluster series. A quasi-equilibrium evolution of the clusters is proposed to extract a parameter characteristic of the cluster recombination process: the effective temperature. The hypothesis of the atomic species' recombination (during the expansion of a high density highly ionized cloud) leading to cluster formation is confirmed to some extent in a second set of experiments: the UV laser ablation of a mixed and non-mixed cesium iodide and potassium bromide targets. These experiments show that the emission yields contain contributions from both the recombination process and from the sample stoichiometry, even for high laser irradiances.

  2. Tunable frequency-stabilization of UV laser using a Hallow-Cathode Lamp of atomic thallium

    CERN Document Server

    Chen, Tzu-Ling; Shy, Jow-Tsong; Liu, Yi-Wei

    2013-01-01

    A frequency-stabilized ultraviolet laser system, locked to the thallium resonant transition of 377.5 nm, was demonstrated using a novel bichromatic spectroscopy technique for tuning the zero-crossing laser-lock point. The atomic thallium system is a promising candidate in atomic parity violation and permanent electric dipole moment experiments, and its 377.5 nm 6P1/2->7S1/2 transition is important for thallium laser cooling and trapping experiment. The pressure shift, owing to the high pressure bu?er gas of the hollow-cathode lamp, was observed using an atomic beam resonance as reference. Such a shift was corrected by adjusting the peak ratio of the two Doppler-free saturation pro?les resulted from two pumping beams with a 130 MHz frequency di?erence. The resulted frequency stability of the ultraviolet laser is ?0.5 MHz at 0.1 sec integration time. This scheme is compact and versatile for stabilizing UV laser systems, which acquire a sub-MHz stability and frequency tunability.

  3. Modélisation de la Physique Atomique et du Transfert Radiatif pour le laser X-UV

    OpenAIRE

    Robillart, Bruno

    2010-01-01

    The X-UV laser sources have been experiencing important development for about ten years. In this spectral range, we are now able to produce highly coherent and intense collimated sources which could have applications in medical imaging, photolithography, or for the diagnostic of dense plasmas... This thesis was dedicated to the modeling of the "OFI" X-UV laser, studied in the LOA (ENSTA, Palaiseau). This type of X-ray laser is generated following the ionization of a gas (Kr, Xe) by a high pow...

  4. Photolithography-free laser-patterned HF acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass

    Science.gov (United States)

    Zamuruyev, Konstantin O.; Zrodnikov, Yuriy; Davis, Cristina E.

    2017-01-01

    Excellent chemical and physical properties of glass, over a range of operating conditions, make it a preferred material for chemical detection systems in analytical chemistry, biology, and the environmental sciences. However, it is often compromised with SU8, PDMS, or Parylene materials due to the sophisticated mask preparation requirements for wet etching of glass. Here, we report our efforts toward developing a photolithography-free laser-patterned hydrofluoric acid-resistant chromium-polyimide tape mask for rapid prototyping of microfluidic systems in glass. The patterns are defined in masking layer with a diode-pumped solid-state laser. Minimum feature size is limited to the diameter of the laser beam, 30 µm minimum spacing between features is limited by the thermal shrinkage and adhesive contact of the polyimide tape to 40 µm. The patterned glass substrates are etched in 49% hydrofluoric acid at ambient temperature with soft agitation (in time increments, up to 60 min duration). In spite of the simplicity, our method demonstrates comparable results to the other current more sophisticated masking methods in terms of the etched depth (up to 300 µm in borosilicate glass), feature under etch ratio in isotropic etch (~1.36), and low mask hole density. The method demonstrates high yield and reliability. To our knowledge, this method is the first proposed technique for rapid prototyping of microfluidic systems in glass with such high performance parameters. The proposed method of fabrication can potentially be implemented in research institutions without access to a standard clean-room facility.

  5. Selective removal of composite sealants with near-UV laser pulses

    Science.gov (United States)

    Louie, Tiffany M.; Jones, Robert S.; Sarma, Anupama V.; Fried, Daniel

    2004-05-01

    It is often necessary to replace pit and fissure sealants and composite restorations. This task is complicated by the necessity for complete removal of the remaining composite to enable suitable adhesion of new composite. Previous studies have shown that lasers pulses from a frequency-tripled Nd:YAG laser (355-nm) can selectively remove residual composite after orthodontic bracket removal on enamel surfaces. UV laser light is preferentially absorbed by polymeric resins and the organic content of the tooth enamel. The objective of this study was to determine if such laser pulses are suitable for selective removal of the old composite from pit and fissure sealants and restorations without damaging surrounding sound tissues. Optical coherence tomography was used to acquire optical cross sections of the occlusal topography and peripheral tooth structure non-destructively before application of the sealants, after sealant application, and after sealant removal with 355-nm laser pulses with intensities ranging from 0-10 J/cm2. Thermocouples were used to monitor the temperature in the pulp chamber during composite removal under clinically relevant ablation rates, i.e., 30 Hz and 30 mJ per laser pulse. At an irradiation intensity of 1.3 J/cm2 pit and fissure sealants were completely removed without visible damage to the underlying enamel. At intensities above 1.5 J/cm2, the laser removes the resin layer while at the same time preferentially etching the surface of the enamel. Temperature excursions in the pulp chamber of extracted teeth was limited to less than 5°C if air-cooling was used during the rapid removal (1-2 min) of sealants, water-cooling was not needed. This is the first presentation of a method for the selective removal of composite restorative materials without damage to the underlying sound tooth structure.

  6. Bleaching of optical activity induced by UV Laser exposure in natural silica

    OpenAIRE

    Cannas, M.; Messina, F.

    2004-01-01

    We report experimental data on two types of natural silica, differing for their OH content, irradiated with UV photons (4.66 eV) from a pulsed Nd:YAG laser. Irradiation induces a reduction of the absorption band at 5.12eV and of the associated emissions at 3.14eV and 4.28eV, ascribed to twofold coordinated Ge (=Ge'') centers pre-existing in our samples. The bleaching is mainly due to the post-irradiation conversion of =Ge'' into the paramagnetic H(II) center via trapping of a H atom. Comparis...

  7. QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

    Science.gov (United States)

    Nowak, Krzysztof Michał; Suganuma, Takashi; Kurosawa, Yoshiaki; Ohta, Takeshi; Kawasuji, Yasufumi; Nakarai, Hiroaki; Saitou, Takashi; Fujimoto, Junichi; Mizoguchi, Hakaru; Sumitani, Akira; Endo, Akira

    2017-01-01

    Successful merger of state-of-the-art, semiconductor quantum-cascade lasers (QCL), with the mature CO2 laser technology, resulted in a delivery of highly-desired qualities of CO2 laser output that were not available previously without much effort. These qualities, such as multi-line operation, excellent spectro-temporal stability and pulse waveform control, became available from a single device of moderate complexity. This paper describes the operation principle and the unique properties of the solid{state seeded CO2 laser, invented for an application in laser-produced-plasma (LPP), extreme-UV (EUV) light source.

  8. Autofluorescence of pigmented skin lesions using a pulsed UV laser with synchronized detection: clinical results

    DEFF Research Database (Denmark)

    Cheng, Haynes Pak Hay; Svenmarker, Pontus; Tidemand-Lichtenberg, Peter;

    2010-01-01

    We report preliminary clinical results of autofluorescence imaging of malignant and benign skin lesions, using pulsed 355 nm laser excitation with synchronized detection. The novel synchronized detection system allows high signal-to-noise ratio to be achieved in the resulting autofluorescence...... signal, which may in turn produce high contrast images that improve diagnosis, even in the presence of ambient room light. The synchronized set-up utilizes a compact, diode pumped, pulsed UV laser at 355 nm which is coupled to a CCD camera and a liquid crystal tunable filter. The excitation and image...... capture is sampled at 5 kHz and the resulting autofluorescence is captured with the liquid crystal filter cycling through seven wavelengths between 420 nm and 580 nm. The clinical study targets pigmented skin lesions and evaluates the prospects of using autofluorescence as a possible means...

  9. UV excimer laser and low temperature plasma treatments of polyamide materials

    Science.gov (United States)

    Yip, Yiu Wan Joanne

    Polyamides have found widespread application in various industrial sectors, for example, they are used in apparel, home furnishings and similar uses. However, the requirements for high quality performance products are continually increasing and these promote a variety of surface treatments for polymer modification. UV excimer laser and low temperature plasma treatments are ideally suited for polyamide modification because they can change the physical and chemical properties of the material without affecting its bulk features. This project aimed to study the modification of polyamides by UV excimer laser irradiation and low temperature plasma treatment. The morphological changes in the resulting samples were analysed by scanning electron microscopy (SEM) and tapping mode atomic force microscopy (TM-AFM). The chemical modifications were studied by x-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and chemical force microscopy (CFM). Change in degree of crystallinity was examined by differential scanning calorimetry (DSC). After high-fluence laser irradiation, topographical results showed that ripples of micrometer size form on the fibre surface. By contrast, sub-micrometer size structures form on the polyamide surface when the applied laser energy is well below its ablation threshold. After high-fluence laser irradiation, chemical studies showed that the surface oxygen content of polyamide is reduced. A reverse result is obtained with low-fluence treatment. The DSC result showed no significant change in degree of crystallinity in either high-fluence or low-fluence treated samples. The same modifications in polyamide surfaces were studied after low temperature plasma treatment with oxygen, argon or tetrafluoromethane gas. The most significant result was that the surface oxygen content of polyamide increased after oxygen and argon plasma treatments. Both treatments induced many hydroxyl (-OH) and carboxylic acid (-COOH

  10. Nanosecond UV lasers stimulate transient Ca2+ elevations in human hNT astrocytes

    Science.gov (United States)

    Raos, B. J.; Graham, E. S.; Unsworth, C. P.

    2017-06-01

    Objective. Astrocytes respond to various stimuli resulting in intracellular Ca2+ signals that can propagate through organized functional networks. Recent literature calls for the development of techniques that can stimulate astrocytes in a fast and highly localized manner to emulate more closely the characteristics of astrocytic Ca2+ signals in vivo. Approach. In this article we demonstrate, for the first time, how nanosecond UV lasers are capable of reproducibly stimulating Ca2+ transients in human hNT astrocytes. Main results. We report that laser pulses with a beam energy of 4-29 µJ generate transient increases in cytosolic Ca2+. These Ca2+ transients then propagate to adjacent astrocytes as intercellular Ca2+ waves. Significance. We propose that nanosecond laser stimulation provides a valuable tool for enabling the study of Ca2+ dynamics in human astrocytes at both a single cell and network level. Compared to previously developed techniques nanosecond laser stimulation has the advantage of not requiring loading of photo-caged or -sensitising agents, is non-contact, enables stimulation with a high spatiotemporal resolution and is comparatively cost effective.

  11. Surface modification induced by UV nanosecond Nd:YVO4 laser structuring on biometals

    Science.gov (United States)

    Fiorucci, M. Paula; López, Ana J.; Ramil, Alberto

    2014-08-01

    Laser surface texturing is a promising tool for improving metallic biomaterials performance in dental and orthopedic bone-replacing applications. Laser ablation modifies the topography of bulk material and might alter surface properties that govern the interactions with the surrounding tissue. This paper presents a preliminary evaluation of surface modifications in two biometals, stainless steel 316L and titanium alloy Ti6Al4V by UV nanosecond Nd:YVO4. Scanning electron microscopy of the surface textured by parallel micro-grooves reveals a thin layer of remelted material along the grooves topography. Furthermore, X-ray diffraction allowed us to appreciate a grain refinement of original crystal structure and consequently induced residual strain. Changes in the surface chemistry were determined by means of X-ray photoelectron spectroscopy; in this sense, generalized surface oxidation was observed and characterization of the oxides and other compounds such hydroxyl groups was reported. In case of titanium alloy, oxide layer mainly composed by TiO2 which is a highly biocompatible compound was identified. Furthermore, laser treatment produces an increase in oxide thickness that could improve the corrosion behavior of the metal. Otherwise, laser treatment led to the formation of secondary phases which might be detrimental to physical and biocompatibility properties of the material.

  12. High reflectivity III-nitride UV-C distributed Bragg reflectors for vertical cavity emitting lasers

    Science.gov (United States)

    Franke, A.; Hoffmann, M. P.; Kirste, R.; Bobea, M.; Tweedie, J.; Kaess, F.; Gerhold, M.; Collazo, R.; Sitar, Z.

    2016-10-01

    UV-C distributed Bragg reflectors (DBRs) for vertical cavity surface emitting laser applications and polariton lasers are presented. The structural integrity of up to 25 layer pairs of AlN/Al0.65Ga0.35N DBRs is maintained by balancing the tensile and compressive strain present between the single layers of the multilayer stack grown on top of an Al0.85Ga0.35N template. By comparing the structural and optical properties for DBRs grown on low dislocation density AlN and AlGaN templates, the criteria for plastic relaxation by cracking thick nitride Bragg reflectors are deduced. The critical thickness is found to be limited mainly by the accumulated strain energy during the DBR growth and is only negligibly affected by the dislocations. A reflectance of 97.7% at 273 nm is demonstrated. The demonstrated optical quality and an ability to tune the resonance wavelength of our resonators and microcavity structures open new opportunities for UV-C vertical emitters.

  13. Photoluminescence of hexagonal boron nitride: effect of surface oxidation under UV-laser irradiation

    CERN Document Server

    Museur, Luc; Petitet, Jean-Pierre; Michel, Jean Pierre; Kanaev, Andrei V

    2008-01-01

    We report on the UV laser induced fluorescence of hexagonal boron nitride (h-BN) following nanosecond laser irradiation of the surface under vacuum and in different environments of nitrogen gas and ambient air. The observed fluorescence bands are tentatively ascribed to impurity and mono (VN), or multiple (m-VN with m = 2 or 3) nitrogen vacancies. A structured fluorescence band between 300 nm and 350 nm is assigned to impurity-band transition and its complex lineshape is attributed to phonon replicas. An additional band at 340 nm, assigned to VN vacancies on surface, is observed under vacuum and quenched by adsorbed molecular oxygen. UV-irradiation of h-BN under vacuum results in a broad asymmetric fluorescence at ~400 nm assigned to m-VN vacancies; further irradiation breaks more B-N bonds enriching the surface with elemental boron. However, no boron deposit appears under irradiation of samples in ambient atmosphere. This effect is explained by oxygen healing of radiation-induced surface defects. Formation o...

  14. Photoacoustic study of curing time by UV laser radiation of a photoresin with different thickness

    Energy Technology Data Exchange (ETDEWEB)

    Pincel, P. Vieyra [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico); Jiménez-Pérez, J.L., E-mail: jimenezp@fis.cinvestav.mx [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico); Cruz-Orea, A. [Departamento de Física, CINVESTAV-IPN, Av. Instituto Politécnico Nacional 2508, Col. San Pedro Zacatenco, C.P. 07360 México, D.F. (Mexico); Correa-Pacheco, Z.N. [Instituto Politécnico Nacional-Centro de Desarrollo de Productos Bióticos (CEPROBI). Carr. Yautepec–Jojutla, km 6. San Isidro, C.P. 62730 Yautepec, Morelos (Mexico); Rosas, J. Hernández [UPIITA IPN, Avenida Instituto Politécnico Nacional, No. 2580, Col. Barrio la Laguna Ticomán, Delegación Gustavo A. Madero, C.P. 07340 México, D.F. (Mexico)

    2015-04-20

    Highlights: • The curing of a resin in the presence of a UV laser radiation was studied. • Open photoacoustic cell technique was used to characterize the curing of the resin. • The curing of the resin as a function of time was studied. • A parabolic behavior of the resin thickness, as a function of time was observed. • UV–vis and FTIR spectroscopy were employed to characterize the resin. - Abstract: This paper deals with the study of the cure of a resin in the presence of a UV laser radiation used as the excitation source, operated at λ = 405 nm, with an output power of 20 mW. The open photoacoustic cell (OPC) technique was used to study the curing of the resins as a function of time. The curing characteristic time values were τ = 10.43, 20.99, 30.18, 45.84, 67.59 and 89.55 s for the resin thicknesses of 1000, 2000, 3000, 4000, 5000 and 6000 μm, respectively. A parabolic behavior of the resin thickness, as a function of the curing characteristic time, was obtained. UV–vis spectroscopy and infrared Fourier transform spectroscopy (FTIR) techniques were employed to characterize the resin in order to study the optical absorption and the chemical bonds, respectively. Our work has applications in the manufacture of 3D printing parts for applications, among others, in medicine.

  15. UV Laser Induced Transmission Change of Pure and Doped Silica Glass

    Institute of Scientific and Technical Information of China (English)

    XIE Junlin; DENG Tao; LUO Jie; BAN Qingrong

    2008-01-01

    Pure and F,GeO2-doped silica glass cut from fiber preforms prepared by plasma assisted chemical vapor deposition(PCVD) were investigated by ultraviolet absorption spectroscopy.The ultraviolet absorption characteristics of these glasses were also studied after UV laser irradiation and heating treatment.It was found that absorption band near 240 nm assigned to GODC was found both in GeO2-doped and F-GeO2 co-doped silica glass,but absorption intensity of the latter was lower than that of the former.It's because F can react with GODC and GeE' simultaneously and reduce their concentration.After irradiation,UV absorption change of F-GeO2 co-doped silica glass was weaker than that of GeO2-doped silica glass,it thus can be concluded that introduction of F could depress the UV absorption of GeO2-doped silica core effectively.

  16. Chromosome mutations and tissue regeneration in the cornea after the UV laser irradiation

    Science.gov (United States)

    Razhev, Alexander M.; Bagayev, Sergei N.; Lebedeva, Lidya I.; Akhmametyeva, Elena M.; Zhupikov, Andrey A.

    2003-06-01

    In present paper the findings on chromosome mutations, the nature of damage and the repair of the cornea tissue after UV irradiation by excimer lasers at 193, 223 and 248 nm were made. Structural mutations induced by short-pulses UV irradiation were shown to be similar to spontaneous ones by the type, time of formation in the mitotic cycle and location of acentrics. Ten hours after irradiation of the cornea with doses of 0,09 to 1,5 J/cm2 the incidence of cells with chromosome aberrations increased linearly with dose and amounted to 11,7% at 248 nm, 5,5% at 223 nm and 2,6% at 193 nm per 1 J/cm2. No induced chromosome aberrations occurred 72 hour following irradiation. Within the dose range from 3,0 to 18 J/cm2 the cytogenesis effect of radiation was less manifest than that with the doses mentioned above, the frequency of chromosome aberrations being independent of either radiation wavelength or radiation dose and amounted of 2,5 to 3,0%. Thus, large doses of powerful short-pulse UV radiation are safe according to the structural mutation criterion.

  17. Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:H

    Energy Technology Data Exchange (ETDEWEB)

    Molpeceres, C. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain)], E-mail: carlos.molpeceres@upm.es; Lauzurica, S.; Garcia-Ballesteros, J.J.; Morales, M.; Guadano, G.; Ocana, J.L. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain); Fernandez, S.; Gandia, J.J. [Dept. de Energias Renovables, Energia Solar Fotovoltaica, CIEMAT, Avda, Complutense 22, 28040 Madrid (Spain); Villar, F.; Nos, O.; Bertomeu, J. [CeRMAE Dept. Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, 08028 Barcelona (Spain)

    2009-03-15

    Lasers are essential tools for cell isolation and monolithic interconnection in thin-film-silicon photovoltaic technologies. Laser ablation of transparent conductive oxides (TCOs), amorphous silicon structures and back contact removal are standard processes in industry for monolithic device interconnection. However, material ablation with minimum debris and small heat affected zone is one of the main difficulty is to achieve, to reduce costs and to improve device efficiency. In this paper we present recent results in laser ablation of photovoltaic materials using excimer and UV wavelengths of diode-pumped solid-state (DPSS) laser sources. We discuss results concerning UV ablation of different TCO and thin-film silicon (a-Si:H and nc-Si:H), focussing our study on ablation threshold measurements and process-quality assessment using advanced optical microscopy techniques. In that way we show the advantages of using UV wavelengths for minimizing the characteristic material thermal affection of laser irradiation in the ns regime at higher wavelengths. Additionally we include preliminary results of selective ablation of film on film structures irradiating from the film side (direct writing configuration) including the problem of selective ablation of ZnO films on a-Si:H layers. In that way we demonstrate the potential use of UV wavelengths of fully commercial laser sources as an alternative to standard backscribing process in device fabrication.

  18. A study of the effect of UV laser annealing on a-SiC films for structure ordering

    CERN Document Server

    Cho, N I; Hong, C; Chae, H B; Kim, C K; Lee, B T

    2000-01-01

    A UV laser annealing was carried out on amorphous SiC films which were deposited on Si substrate by using plasma-enhanced chemical-vapour deposition. Scanning electron microscope micrographs taken from the surfaces of the films exhibited images of grains that were not presented before the UV laser treatment. Fourier-transformed infrared and X-ray diffraction experiments identified those grains as microcrystals of SiC and Si transformed from the amorphous state. Auger electron spectroscopy depth profiling analysis showed that there were more Si atoms than C atoms in the layer. The resistivities of films changed abruptly from 170 OMEGA cm to 226 k OMEGA cm after UV laser annealing.

  19. The VIRMOS mask manufacturing tools; 2, Mask manufacturing and handling

    CERN Document Server

    Conti, G; Mattaini, E; MacCagni, D; Lefèvre, O; Saisse, M; Vettolani, G

    1999-01-01

    We describe the VIRMOS Mask Manufacturing Unit (MMU) configuration, composed of two units:the Mask Manufacturing Machine (with its Control Unit) and the Mask Handling Unit (inclusive of Control Unit, Storage Cabinets and robot for loading of the Instrument Cabinets). For both VIMOS and NIRMOS instruments, on the basis of orders received by the Mask Preparation Software (see paper (a) in same proceedings), the function of the MMU is to perform an off-line mask cutting and identification, followed by mask storing and subsequent filling of the Instrument Cabinets (IC). We describe the characteristics of the LPKF laser cutting machine and the work done to support the choice of this equipment. We also describe the remaining of the hardware configuration and the Mask Handling Software.

  20. Selective degradation of lignin and elimination of HO·radicals in pulps by O3 and UV laser flash irradiation

    Institute of Scientific and Technical Information of China (English)

    林鹿; 周贤涛; 邱玉桂

    2002-01-01

    HO·radical is an aggressive reagent to abstract hydrogen from diverse substitutes and lead them to degradation, however, in reaction of active oxygen species with lignins, complex phenolic polymers, in dispersed lignocellulose such as pulp for environment-benign delignification, HO· radicals should be eliminated as more as possible to prevent cellulose from unfavorably concomitant degradation. A reaction system of O3 is constructed under UV laser flash irradiation, and HO·radicals are controlled efficiently by it. A new mechanism is proposed, for the first time, that O·radicals generated from reaction of O3 with UV laser flash irradiation might be the contributor to scavenge HO·radicals.

  1. Selective degradation of lignin and elimination of HO radicals in pulps by O3 and UV laser flash irradiation

    Institute of Scientific and Technical Information of China (English)

    林鹿; 周贤涛; 邱玉桂

    2002-01-01

    HO radical is an aggressive reagent to abstract hydrogen from diverse substitutes and lead them to degradation, however, in reaction of active oxygen species with lignins, complex phenolic polymers, in dispersed lignocellulose such as pulp for environment-benign delignification, HO radicals should be eliminated as more as possible to prevent cellulose from unfavorably concomitant degradation. A reaction system of O3 is constructed under UV laser flash irradiation, and HO radicals are controlled efficiently by it. A new mechanism is proposed, for the first time, that O radicals generated from reaction of O3 with UV laser flash irradiation might be the contributor to scavenge HO radicals.

  2. Formation of quasi-periodic nano- and microstructures on silicon surface under IR and UV femtosecond laser pulses

    Energy Technology Data Exchange (ETDEWEB)

    Ionin, Andrei A; Golosov, E V; Kolobov, Yu R; Kudryashov, Sergei I; Ligachev, A E; Makarov, Sergei V; Novoselov, Yurii N; Seleznev, L V; Sinitsyn, D V

    2011-09-30

    Quasi-periodic nano- and microstructures have been formed on silicon surface using IR ( {lambda} Almost-Equal-To 744 nm) and UV ( {lambda} Almost-Equal-To 248 nm) femtosecond laser pulses. The influence of the incident energy density and the number of pulses on the structured surface topology has been investigated. The silicon nanostructurisation thresholds have been determined for the above-mentioned wavelengths. Modulation of the surface relief at the doubled spatial frequency is revealed and explained qualitatively. The periods of the nanostructures formed on the silicon surface under IR and UV femtosecond laser pulses are comparatively analysed and discussed.

  3. Laser-induced backside wet etching of silica glass with ns-pulsed DPSS UV laser at the repetition rate of 40 kHz

    Energy Technology Data Exchange (ETDEWEB)

    Niino, Hiroyuki; Kawaguchi, Yoshizo; Sato, Tadatake; Narazaki, Aiko; Gumpenberger, Thomas; Kurosaki, Ryozo [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, Higashi, Tsukuba, Ibaraki 305-8565 (Japan)

    2007-04-15

    Surface micro-structuring of silica glass plates was performed by using laser- induced backside wet etching (LIBWE) upon irradiation with a single-mode laser beam from a diode-pumped solid-state (DPSS) UV laser with 40 kHz repetition rate at 266 nm. We have succeeded in a well-defined micro-pattern formation without debris and microcrack generation around the etched area on the basis of a galvanometer scanning system for the laser beam. Bubble dynamics after liquid ablation was monitored by impulse pressure detection with a fast- response piezoelectric pressure gauge.

  4. In situ diagnosis of pulsed UV laser surface ablation of tungsten carbide hardmetal by using laser-induced optical emission spectroscopy

    Science.gov (United States)

    Li, Tiejun; Lou, Qihong; Wei, Yunrong; Huang, Feng; Dong, Jingxing; Liu, Jingru

    2001-12-01

    Surface ablation of cobalt cemented tungsten carbide hardmetal with pulsed UV laser has been in situ diagnosed by using the technique of laser-induced optical emission spectroscopy. The dependence of emission intensity of cobalt lines on number of laser shots was investigated at laser fluence of 2.5 J/cm 2. As a comparison, the reliance of emission intensity of cobalt lines as a function of laser pulse number by using pure cobalt as ablation sample was also studied at the same laser condition. It was found that for surface ablation of tungsten carbide hardmetal at laser fluence of 2.5 J/cm 2, the intensities of cobalt lines fell off dramatically in the first 300 consecutive laser shots and then slowed down to a low stable level with even more shots. For surface ablation of pure cobalt at the same laser condition, the intensities of cobalt lines remained constant more or less even after 500 laser shots and then reduced very slowly with even more shots. It was concluded that selective evaporation of cobalt at this laser fluence should be responsible for the dramatic fall-off of cobalt lines with laser shots accumulation for surface ablation of tungsten carbide hardmetal. In contrast, for surface ablation of pure cobalt, the slow reduction of cobalt lines with pulse number accumulation should be due to the formation of laser-induced crater effect.

  5. Improved adhesion of diamond coating on cobalt-cemented tungsten carbide hardmetal by using pulsed-UV-laser substrate surface pretreatment

    Science.gov (United States)

    Tiejun, Li; Qihong, Lou; Jingxing, Dong; Yunrong, Wei; Jun, Zhou; Jingru, Liu; Zhiming, Zhang; Fanghong, Sun

    2002-06-01

    Pulsed-UV-laser surface ablation has been applied in substrate pretreatment in order to obtain good adhesion of diamond coating grown on cobalt-cemented tungsten carbide hardmetal. The dependence of diamond coating's adhesion on different shots of pulsed-UV-laser substrate pretreatment has been studied experimentally. The results were compared with diamond coating deposited by using traditional acid-etching substrate pretreatment. It was shown that adhesion of diamond coating grown on tungsten carbide hardmetal has been greatly improved by using pulsed-UV-laser substrate pretreatment. The corresponding laser pretreatment condition for the optimal adhesion of diamond coatings was finally obtained. It has been demonstrated that pulsed-UV-laser substrate pretreatment should be a feasible and effective method for improving adhesion of diamond coating on cobalt-cemented tungsten carbide hardmetal. It is the characteristic surface morphology produced by pulsed-UV-laser surface ablation that subsequently results in this improved adhesion of diamond coating grown on tungsten carbide hardmetal. The number of laser shots being used in substrate pretreatment has a great influence to the adhesion of diamond coating deposited on tungsten carbide hardmetal. One should always apply proper number of laser shots in pulsed-UV-laser substrate pretreatment when seeking for the optimal adhesion of diamond coating on tungsten carbide hardmetal. In this work, the corresponding number of laser shots for the optimal adhesion of diamond coating has found to be 300 laser shots.

  6. Vacuum isostatic micro/macro molding of PTFE materials for laser beam shaping in environmental applications: large scale UV laser water purification

    Science.gov (United States)

    Lizotte, Todd; Ohar, Orest

    2009-08-01

    Accessibility to fresh clean water has determined the location and survival of civilizations throughout the ages [1]. The tangible economic value of water is demonstrated by industry's need for water in fields such as semiconductor, food and pharmaceutical manufacturing. Economic stability for all sectors of industry depends on access to reliable volumes of good quality water. As can be seen on television a nation's economy is seriously affected by water shortages through drought or mismanagement and as such those water resources must therefore be managed both for the public interest and the economic future. For over 50 years ultraviolet water purification has been the mainstay technology for water treatment, killing potential microbiological agents in water for leisure activities such as swimming pools to large scale waste water treatment facilities where the UV light photo-oxidizes various pollutants and contaminants. Well tailored to the task, UV provides a cost effective way to reduce the use of chemicals in sanitization and anti-biological applications. Predominantly based on low pressure Hg UV discharge lamps, the system is plagued with lifetime issues (~1 year normal operation), the last ten years has shown that the technology continues to advance and larger scale systems are turning to more advanced lamp designs and evaluating solidstate UV light sources and more powerful laser sources. One of the issues facing the treatment of water with UV lasers is an appropriate means of delivering laser light efficiently over larger volumes or cross sections of water. This paper examines the potential advantages of laser beam shaping components made from isostatically micro molding microstructured PTFE materials for integration into large scale water purification and sterilization systems, for both lamps and laser sources. Applying a unique patented fabrication method engineers can form micro and macro scale diffractive, holographic and faceted reflective structures

  7. Temperature-insensitive frequency tripling for generating high-average power UV lasers.

    Science.gov (United States)

    Zhong, Haizhe; Yuan, Peng; Wen, Shuangchun; Qian, Liejia

    2014-02-24

    Aimed for generating high-average power ultraviolet (UV) lasers via third-harmonic generation (THG) consisting of frequency doubling and tripling stages, we numerically and experimentally demonstrate a novel frequency tripling scheme capable of supporting temperature-insensitive phase-matching (PM). Two cascaded tripling crystals, with opposite signs of the temperature derivation of phase-mismatch, are proposed and theoretically studied for improving the temperature-acceptance of PM. The proof-of-principle tripling experiment using two crystals of LBO and BBO shows that the temperature acceptance can be ~1.5 times larger than that of using a single tripling crystal. In addition, the phase shift caused by air dispersion, along with its influence on the temperature-insensitive PM, are also discussed. To illustrate the potential applications of proposed two-crystal tripling design in the high-average-power regime, full numerical simulations for the tripling process, are implemented based on the realistic crystals. The demonstrated two-crystal tripling scheme may provide a promising route to high-average-power THG in the UV region.

  8. Transverse UV-laser irradiation-induced defects and absorption in a single-mode erbium-doped optical fiber

    Energy Technology Data Exchange (ETDEWEB)

    Tortech, B.; Ouerdane, Y.; Boukenter, A.; Meunier, J. P. [Univ St Etienne, Lab Hubert Curien, CNRS, UMR 5516, F-42000 St Etienne (France); Girard, S. [CEA Bruyeres le Chatel, DIF, 91 (France); Van Uffelen, M.; Berghmans, F. [CEN SCK, B-2400 Mol (Belgium); Regnier, E. [Draka Comteq France, Data Ctr 4, F-91460 Marcoussis (France); Berghmans, F.; Thienpont, H. [Vrije Univ Brussels, B-1050 Brussels, (Belgium)

    2009-07-15

    Near UV-visible absorption coefficients of an erbium-doped optical fiber were investigated through an original technique based on a transverse cw UV-laser irradiation operating at 244 nm. Such irradiation leads to the generation of a quite intense guided luminescence signal in near UV spectral range. This photoluminescence probe source combined with a longitudinal translation of the fiber sample (at a constant velocity) along the UV-laser irradiation, presents several major advantages: (i) we bypass and avoid the procedures classically used to study the radiation induced attenuation which are not adapted to our case mainly because the samples present a very strong absorption with significant difficulties due to the injection of adequate UV-light levels in a small fiber diameter: (ii) the influence of the laser irradiation on the host matrix of the optical fiber is directly correlated to the evolution of the generated photoluminescence signal and (iii) in our experimental conditions, short fiber sample lengths (typically 20-30 cm) suffice to determine the associated absorption coefficients over the entire studied spectral domain. The generated photoluminescence signal is also used to characterize the absorption of the erbium ions in the same wavelength range with no cut-back method needed. (authors)

  9. Locking IR and UV diode lasers to a visible laser using a LabVIEW PID controller on a Fabry-Perot signal

    CERN Document Server

    Kwolek, J M; Goodman, D S; Smith, W W

    2015-01-01

    Simultaneous laser locking of IR and UV lasers to a visible reference laser is demonstrated via a Fabry-Perot cavity. LabVIEW is used to analyze the input and an internal PID algorithm converts the Fabry-Perot signal to an analog locking feedback signal. The locking program stabilized both lasers to a long term stability of less than 12 MHz, with the lab-built IR laser undergoing signi?cant improvement in frequency stabilization. The results of this study demonstrate the viability of a simple computer-controlled, non temperature-stabilized Fabry-Perot locking scheme for our applications, laser cooling of Ca+ ions, and its use in other applications with similar modest frequency stabilization requirements.

  10. A new nanosecond UV laser at 355 nm: early results of corneal flap cutting in a rabbit model.

    Science.gov (United States)

    Trost, Andrea; Schrödl, Falk; Strohmaier, Clemens; Bogner, Barbara; Runge, Christian; Kaser-Eichberger, Alexandra; Krefft, Karolina; Vogel, Alfred; Linz, Norbert; Freidank, Sebastian; Hilpert, Andrea; Zimmermann, Inge; Grabner, Günther; Reitsamer, Herbert A

    2013-12-03

    A new 355 nm UV laser was used for corneal flap cutting in an animal model and tested for clinical and morphologic alterations. Corneal flaps were created (Chinchilla Bastards; n = 25) with an UV nanosecond laser at 355 nm (150 kHz, pulse duration 850 ps, spot-size 1 μm, spot spacing 6 × 6 μm, side cut Δz 1 μm; cutting depth 130 μm) and pulse energies of 2.2 or 2.5 μJ, respectively. Following slit-lamp examination, animals were killed at 6, 12, and 24 hours after treatment. Corneas were prepared for histology (hematoxylin and eosin [HE], TUNEL-assay) and evaluated statistically, followed by ultrastructural investigations. Laser treatment was tolerated well, flap lift was easier at 2.5 μJ compared with 2.2 μJ. Standard HE at 24 hours revealed intact epithelium in the horizontal cut, with similar increase in corneal thickness at both energies. Irrespective of energy levels, TUNEL assay revealed comparable numbers of apoptotic cells in the horizontal and vertical cut at 6, 12, and 24 hours, becoming detectable in the horizontal cut as an acellular stromal band at 24 hours. Ultrastructural analysis revealed regular morphology in the epi- and endothelium, while in the stroma, disorganized collagen lamellae were detectable representing the horizontal cut, again irrespective of energy levels applied. This new UV laser revealed no epi- nor endothelial damage at energies feasible for corneal flap cutting. Observed corneal swelling was lower compared with existing UV laser studies, albeit total energy applied here was much higher. Observed loss of stromal keratinocytes is comparable with available laser systems. Therefore, this new laser is suitable for refractive surgery, awaiting its test in a chronic environment.

  11. Effects of laser pretreatment on cells of broad bean in UV-B-induced damage protection%激光预处理可保护蚕豆细胞免受UV-B辐射的损伤

    Institute of Scientific and Technical Information of China (English)

    齐智; 岳明; 王勋陵

    2000-01-01

    The embryos of broad bean (Vicia faba L.) were irradiated for 5 min by a He-Ne laser (632.8 nm,1.63 J·mm-2) or for 1 min by a CO2 laser (1,060 nm,2.53 J·mm-2).Afterwards they were cultivated in Petri dish in the constant temperature incubator in Knop until the length of epicotyl of broad bean was perhaply 3 cm that could be treated by ultraviolet-B (UV-B) radiation.The epicotyl of broad bean was irradiated for 7 h by 1.02,3.03,4.52 kJ·m-2 UV-B respectively in the ambient condition of 70 μmol·m-2·s-1 photosynthetically active radiation (PAR) in the growth cabinet.According to the changes of content of MDA,ascorbate acid (AsA) and UV-B absorbing compounds (absorbance at 300 nm),the effects of protecting of laser to the epicotyl of broad bean from UV-B radiation were tested.The results showed that laser pretreatment on the embryos could enhance the resistance of UV-B stress in epicotyl.Comparing with the control (without UV-B or laser radiation) and UV-B radiation alone,the MDA content was decreased significantly while AsA content was increased in the condition of laser pretreatment.It was also found that laser pretreatment alone could improve the content of UV-B absorbing compounds.If laser pretreatment followed UV-B radiation,the content of UV-B absorbing compounds was improved higher than laser treatment and UV-B treatment respectively.We suppose that laser pretreatment could enhance stress resistance in plant by a pathway of increasing the content of AsA and UV-B absorbing compounds while decreasing the MDA concentration.%当蚕豆的胚被He-Ne激光(632.8 nm,1.63 J·mm-2)照射5 min或被CO2激光(1060 nm,2.53 J·mm-2) 照射1 min后,将其置入Knop营养液中进行恒温培养.当蚕豆的上胚轴长到大约3 cm时,在光背景(PAR)为70 μmol·m-2·s-1条件下,分别用1.02、3.03、4.52 kJ·m-2的UV-B 辐射蚕豆的上胚轴7 h.根据蚕豆丙二醛(MDA)、抗坏血酸(AsA)和UV-B吸收物的含量变化,来测试激光对UV-B照射蚕豆的上

  12. UV-Visible Absorption Spectroscopy Enhanced X-ray Crystallography at Synchrotron and X-ray Free Electron Laser Sources.

    Science.gov (United States)

    Cohen, Aina E; Doukov, Tzanko; Soltis, Michael S

    2016-01-01

    This review describes the use of single crystal UV-Visible Absorption micro-Spectrophotometry (UV-Vis AS) to enhance the design and execution of X-ray crystallography experiments for structural investigations of reaction intermediates of redox active and photosensitive proteins. Considerations for UV-Vis AS measurements at the synchrotron and associated instrumentation are described. UV-Vis AS is useful to verify the intermediate state of an enzyme and to monitor the progression of reactions within crystals. Radiation induced redox changes within protein crystals may be monitored to devise effective diffraction data collection strategies. An overview of the specific effects of radiation damage on macromolecular crystals is presented along with data collection strategies that minimize these effects by combining data from multiple crystals used at the synchrotron and with the X-ray free electron laser.

  13. Experimental studies of X-UV rays by a laser plasma: X-UV strioscopy by means of multilayer mirrors; Etude experimentale de la refraction X-UV par un plasma laser: strioscopie X-UV a l`aide de miroirs multicouches

    Energy Technology Data Exchange (ETDEWEB)

    Lutrin, F

    1996-05-20

    This thesis studies a new instrument -from its conception to the measures interpretation- that analyses electronic density gradient in the super critical transportation area of a laser plasma (0,35 {mu}m). This device, so-called of X-UV Schlieren, is based on the refraction property of a probe beam by an index gradient. Its specificity is the use of the X-UV emission at 13 nm (92 eV) of another laser plasma as X-UV probe. The conception and characterization of this instrument are defined thanks to both the emissivity and reflectivity properties of laser plasmas and the reflectivity properties of multilayers. Within this report are presented strioscopy images, spatially and spectrally resolved of an aluminium plasma from a 3.10{sup 12} W/cm{sup 2} laser flux, probed by a 13 nm wavelength. The device has to be closely aligned so as to obtain good contrast and good spatial resolution. For the first time, the refraction of a X-UV probe beam by a laser plasma is displayed. The experiments show that this refraction is all the more obvious for a gold probe plasma of energy 105 J and an aluminium probed plasma of energy 1 J. According to our plasma hydrodynamic simulation, the detected refraction corresponds to an electronic density gradient of 6,5.10{sup 25} electrons/cm{sup 4} in the two first microns of the sur-critical area. To study the parameters dependence of this gradient in the sur-critical area, several solutions for improving the instrument are produced. (author) 168 refs.

  14. Laser- and UV-assisted modification of polystyrene surfaces for control of protein adsorption and cell adhesion

    Science.gov (United States)

    Pfleging, Wilhelm; Torge, Maika; Bruns, Michael; Trouillet, Vanessa; Welle, Alexander; Wilson, Sandra

    2009-03-01

    An appropriate choice of laser and process parameters enables new approaches for the fabrication of polymeric lab-on-chip devices with integrated functionalities. We will present our current research results in laser-assisted modification of polystyrene (PS) with respect to the fabrication of polymer devices for cell culture applications. For this purpose laser micro-patterning of PS and subsequent surface functionalization was investigated as function of laser and process parameters. A high power ArF-excimer laser radiation source with a pulse length of 19 ns as well as a high repetition ArF-excimer laser source with a pulse length of 5 ns were used in order to study the influence of laser pulse length on laser-induced surface oxidation. The change in surface chemistry was characterized by X-ray photoelectron spectroscopy and contact angle measurements. The difference between laser-assisted modification versus UV-lamp assisted modification was investigated. A photolytic activation of specific areas of the polymer surface and subsequent oxidization in oxygen or ambient air leads to a chemically modified polymer surface bearing carboxylic acid groups well-suited for controlled competitive protein adsorption or protein immobilization. Finally, distinct areas for cell growth and adhesion are obtained.

  15. Mask-free construction of three-dimensional silicon structures by dry etching assisted gray-scale femtosecond laser direct writing

    Science.gov (United States)

    Liu, Xue-Qing; Yu, Lei; Chen, Qi-Dai; Sun, Hong-Bo

    2017-02-01

    A mask-free micro/nano fabrication method is proposed for constructing arbitrary gradient height structures on silicon, combining gray-scale femtosecond laser direct writing (GS-FsLDW) with subsequent dry etching. Arbitrary two-dimensional patterns with a gradient concentration of oxygen atoms can be fabricated on the surface of undoped silicon wafer by FsLDW in air. After dry etching, various three-dimensional (3D) gradient height silicon structures are fabricated by controlling the laser power, scanning step, etching time, and etching power. As an example, a well-defined 3D Fresnel zone plate was fabricated on silicon wafer, which shows excellent focusing and imaging properties. The combination of high precision from dry etching and 3D fabrication ability on non-planar substrates of FsLDW, may broaden its applications in microelectronics, micro-optics, and microelectromechanical systems.

  16. Alternating phase shift mask technology for 65nm logic applications

    Science.gov (United States)

    Chakravorty, Kishore K.; Henrichs, Sven; Qiu, Wei; Chavez, Joas L.; Liu, Yi-Ping; Ghadiali, Firoz; Yung, Karmen; Wilcox, Nathan; Silva, Mary; Ma, Jian; Qu, Ping; Irvine, Brian; Yun, Henry; Cheng, Wen-Hao; Farnsworth, Jeff

    2006-03-01

    Alternating Phase Shift Mask (APSM) Technology has been developed and successfully implemented for the poly gate of 65nm node Logic application at Intel. This paper discusses the optimization of the mask design rules and fabrication process in order to enable high volume manufacturability. Intel's APSM technology is based on a dual sided trenched architecture. To meet the stringent OPC requirements associated with patterning of narrow gates required for the 65nm node, Chrome width between the Zero and Pi aperture need to be minimized. Additionally, APSM lithography has an inherently low MEEF that furthermore, drives a narrower Chrome line as compared to the Binary approach. The double sided trenched structure with narrow Chrome lines are mechanically vulnerable and prone to damage when exposed to conventional mask processing steps. Therefore, new processing approaches were developed to minimize the damage to the patterned mask features. For example, cleaning processes were optimized to minimize Chrome & quartz damage while retaining the cleaning effectiveness. In addition, mask design rules were developed which ensured manufacturability. The narrow Chrome regions between the zero and Pi apertures severely restrict the tolerance for the placement of the second level resists edges with respect to the first level. UV Laser Writer based resist patterning capability, capable of providing the required Overlay tolerance, was developed, An AIMS based methodology was used to optimize the undercut and minimize the aerial image CD difference between the Zero and Pi apertures.

  17. High-repetition-rate compact excimer laser: UV light source for metrology, inspection, direct writing, and material testing

    Science.gov (United States)

    Huber, Heinz P.; Pflanz, Tobias; Goertler, Andreas; Schillinger, Helmut

    2003-06-01

    The discharge pumped excimer laser is a gas laser providing ultra violet (UV) radiation with well defined spectral, temporal and spatial properties. The fast development of excimer lasers in recent years has succeeded in designing very compact, table-top and turn-key systems delivering up to 20 W of radiation at 248 nm, 10 W at 193 nm and 2 W at 157 nm with repetition rates up to 2000 Hz (1, 5). Due to their short emission wavelength and compactness they are continuously replacing other light sources, like lamps and ion lasers, in applications as metrology, inspection, direct writing and material testing. Spatial and temporal beam properties of compact excimer lasers are very suitable to be utilized as illumination source in these applications. The compact excimer laser is combining the advantages of both, lamp and laser sources. It displays low temporal and spatial coherence, but has a narrow spectral emission range of a few hundred pm. The beam area is approximately 1/2 cm2, the divergence is in the order of 1 mrad. Variation of beam position and beam direction are negligible for most illumination applications. Compact excimer lasers are easy to integrate in measurement and inspection systems. Typically their footprint area is 0.25 m2. The power consumption is less than 1 kW, enabling single phase electrical supply and air cooling. State-of-the-art compact excimer lasers are compliant to all relevant SEMI regulations. The laser optics exceeds the life time of the laser tube, thus no optics cleaning and exchange is necessary in a whole life time of a laser tube of a few billion pulses (6).

  18. Investigation of UV-laser induced electrons in the KATRIN main spectrometer

    Energy Technology Data Exchange (ETDEWEB)

    Weis, Johannes; Hilk, Daniel [Institut fuer experimentelle Kernphysik, KIT, Karlsruhe (Germany); Collaboration: KATRIN-Collaboration

    2015-07-01

    The KArlsruhe TRItium Neutrino (KATRIN) experiment aims to determine the effective mass of the electron anti neutrino with a sensitivity of 200 meV/c{sup 2} via the precise measurement of the tritium beta decay spectrum close to its endpoint energy of 18.6 keV. To achieve the desired sensitivity a very low background rate of 10{sup -2} electrons per second is necessary. Cosmic muons produce a large number of secondary electrons at the inner surface of the KATRIN main spectrometer. These secondary electrons are mostly suppressed via magnetic shielding effects, however some of these electrons can reach the focal plane detector and contribute to the background. In order to shield these electrons, an electrostatic retarding potential is produced by a dual-layer wire electrode system, installed at the inner surface of the spectrometer vessel. An UV laser system is used to generate a large number of low-energy secondary electrons via photoelectric effect at dedicated positions inside the main spectrometer vessel. These electrons are used to investigate the efficiency of the electrostatic shielding for different electrode potentials. This talk presents measurement results recently obtained in context of the second commissioning phase of the main spectrometer.

  19. Ruthenium Grubbs' catalyst nanostructures grown by UV-excimer-laser ablation for self-healing applications

    Science.gov (United States)

    Aïssa, B.; Nechache, R.; Haddad, E.; Jamroz, W.; Merle, P. G.; Rosei, F.

    2012-10-01

    A self healing composite material consisting of 5-Ethylidene-2-Norbornene (5E2N) monomer reacted with Ruthenium Grubbs' Catalyst (RGC) was prepared. First, the kinetics of the 5E2N ring opening metathesis polymerization (ROMP) reaction RGC was studied as a function of temperature. We show that the polymerization reaction is still effective in a large temperature range (-15 to 45 °C), occurring at short time scales (less than 1 min at 40 °C). Second, the amount of RGC required for ROMP reaction significantly decreased through its nanostructuration by means of a UV-excimer laser ablation process. RGC nanostructures of few nanometers in size where successfully obtained directly on silicon substrates. The X-ray photoelectron spectroscopy data strongly suggest that the RGC still keep its original stoichiometry after nanostructuration. More importantly, the associated ROMP reaction was successfully achieved at an extreme low RGC concentration equivalent to (11.16 ± 1.28) × 10-4 Vol.%, occurring at very short time reaction. This approach opens new prospects for using healing agent nanocomposite materials for self-repair functionality, thereby obtaining a higher catalytic efficiency per unit mass.

  20. Laser desorption time-of-flight mass spectrometry of vacuum UV photo-processed methanol ice

    Science.gov (United States)

    Paardekooper, D. M.; Bossa, J.-B.; Linnartz, H.

    2016-07-01

    Context. Methanol in the interstellar medium mainly forms upon sequential hydrogenation of solid CO. With typical abundances of up to 15% (with respect to water) it is an important constituent of interstellar ices where it is considered as a precursor in the formation of large and complex organic molecules (COMs), e.g. upon vacuum UV (VUV) photo-processing or exposure to cosmic rays. Aims: This study aims at detecting novel complex organic molecules formed during the VUV photo-processing of methanol ice in the laboratory using a technique more sensitive than regular surface diagnostic tools. In addition, the formation kinetics of the main photo-products of methanol are unravelled for an astronomically relevant temperature (20 K) and radiation dose. Methods: The VUV photo-processing of CH3OH ice is studied by applying laser desorption post-ionisation time-of-flight mass spectrometry (LDPI TOF-MS), and analysed by combining molecule-specific fragmentation and desorption features. Results: The mass spectra correspond to fragment ions originating from a number of previously recorded molecules and from new COMs, such as the series (CO)xH, with x = 3 and y prebiotic glycerin belongs. The formation of these large COMs has not been reported in earlier photolysis studies and suggests that such complex species may form in the solid state under interstellar conditions.

  1. Ultrastable and Compact Deep UV Laser Source for Raman Spectroscopy Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Deep-ultraviolet (UV) Raman spectroscopy is a powerful method to collect chemically specific information about complex samples because deep-UV (?? < 250 nm)...

  2. Spectrum Blueshifting of Ultrashort UV Laser Pulse Induced by Ionization of Supersonic He and Ar Gas Jets

    Institute of Scientific and Technical Information of China (English)

    YAN Lixin; ZHANG Yongsheng; LIU Jingru; HUANG Wenhui; TANG Chuanxiang; CHENG Jianping

    2008-01-01

    The predominant spectral blueshifting of a sub-picosecond UV laser pulse induced by ultrafast ionization of noble gases was investigated. Spectral measurements were made at various gas densities. Typical quasi-periodic structures in the blueshifted spectrum were obtained. The observations were in connection with the so-called self-phase modulation of laser pulses in the ultrafast ionization process which was simply simulated with an ADK (Ammosov-Delone-Krainov) ionization model. Some quantitative information can be deduced from the measurements and calculations.

  3. Modeling the Kinetics of Enhanced Photo-Polymerization under a Collimated and a Reflecting Focused UV Laser

    Directory of Open Access Journals (Sweden)

    Jui-Teng Lin

    2014-05-01

    Full Text Available This study explored the kinetics of ultraviolet (UV laser photoinitiated polymerization in thick polymer systems to achieve improved polymerization efficiency and uniformity. The modeling system comprised an incident UV laser and its reflecting beam, which was focused by a concave mirror to compensate for the exponential decay in the absorbing medium. The polymerization kinetic equation was numerically solved for the initiator concentration. The crossover time was calculated and compared among single beam, two collimated beam and collimated plus reflecting focused-beam systems. For the single beam case, analytic formulas for the time dependent incident beam is derived and demonstrated by measured data. A theoretical crossover time is defined to analyze the measured data based on the dynamic moduli. Lastly, the polymerization boundary dynamics are illustrated, showing the advantage of the combined two beam system. The numerical results provide useful guidance and a novel means for accelerated uniform photo-polymerization, which cannot be achieved by other means.

  4. Modified surface morphology in surface ablation of cobalt-cemented tungsten carbide with pulsed UV laser radiation

    Science.gov (United States)

    Li, Tiejun; Lou, Qihong; Dong, Jingxing; Wei, Yunrong; Liu, Jingru

    2001-03-01

    Surface ablation of cobalt-cemented tungsten carbide hardmetal has been carried out in this work using a 308 nm, 20 ns XeCl excimer laser. The influence of ablation rate, surface roughness, surface micromorphology as well as surface phase structure on laser conditions including laser irradiance and pulse number have been investigated. The experimental results showed that the ablation rate and surface roughness were controlled by varying the number of pulses and laser irradiance. The microstructure and crystalline structure of irradiated surface layer varied greatly with different laser conditions. After 300 shots of laser irradiation at irradiance of 125 MW/cm 2, the surface micromorphology characterizing a uniform framework pattern of "hill-valleys". With the increment of laser shots at laser irradiance of 125 MW/cm 2, the microstructure of cemented tungsten carbide transformed from original polygon grains with the size of 3 μm to interlaced large and long grains after 300 shots of laser irradiation, and finally to gross grains with the size of 10 μm with clear grain boundaries after 700 shots. The crystalline structure of irradiated area has partly transformed from original WC to β-WC 1- x, then to α-W 2C and CW 3, and finally to W crystal. At proper laser irradiance and pulse number, cobalt binder has been selectively removed from the surface layer of hardmetal. It has been demonstrated that surface ablation with pulsed UV laser should be a feasible way to selectively remove cobalt binder from surface layer of cemented tungsten carbide hardmetal.

  5. UV laser ablation to measure cell and tissue-generated forces in the zebrafish embryo in vivo and ex vivo.

    Science.gov (United States)

    Smutny, Michael; Behrndt, Martin; Campinho, Pedro; Ruprecht, Verena; Heisenberg, Carl-Philipp

    2015-01-01

    Mechanically coupled cells can generate forces driving cell and tissue morphogenesis during development. Visualization and measuring of these forces is of major importance to better understand the complexity of the biomechanic processes that shape cells and tissues. Here, we describe how UV laser ablation can be utilized to quantitatively assess mechanical tension in different tissues of the developing zebrafish and in cultures of primary germ layer progenitor cells ex vivo.

  6. Resistless photochemical etching of a silicon wafer by UV laser with an H2O2 and HF aqueous solution

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    A new resistless etching method has been developed for Silicon wafers. This new method uses an aqueous solution consisting of hydrogen peroxide (H2O2) and hydrogen fluoride (HF) as the activating etchants. A 193 nm ArF excimer laser and a 266 nm fourth harmonic generation Nd:YAG laser were used as the photon sources. Results showed that pattern etching has been achieved without any photoresist film. In the case of the 193 nm laser, the optimal etching appeared at a 1.3 H2O2/HF ratio, where an etch depth of 210 nm was achieved with a fluence of 29 mJ/cm2 and shot number of 10000. At the same conditions, the etch depth with H2O2 and HF solution was three times of that by using H2O and HF mixture. In the case of the 266 nm Nd:YAG laser, the optimal etching appeared at twice ratio of H2O2/HF, where the etch depth of 420 nm was achieved with a fluence of 12 mJ/cm2 and shot number of 30000. Results showed that the etch effect of the 266 nm Nd: YAG laser was more desirable than that of the 193 nm ArF excimer laser.``Keyords: UV laser, resistless photochemical etching, hydrogen peroxide (H2O2).

  7. Run-away electron preionized diffuse discharge as a source of efficient laser emission in the IR, UV, VUV

    Science.gov (United States)

    Panchenko, A. N.; Panchenko, N. A.; Tarasenko, V. F.

    2017-05-01

    REP DD was suggested as an excitation source of various gas lasers. The efficient lasing was obtained in the IR, UV, and VUV spectral ranges. The ultimate intrinsic efficiency of non-chain chemical lasers on HF(DF) molecules was achieved. REP DD pumped N2 laser with an ultimate electrical efficiency of 0.2% was developed. Lasing on N2 molecules with 2 or 3 peaks in successive REP DD current oscillations was obtained for the first time. The laser action on F2* at 157 nm and rare gas fluorides (KrF*, XeF*) under REP DD pumping was obtained for the first time, as well. It has been shown that the volume stage of REP DD in mixtures with fluorine can last over 50 ns during several current half-cycles. Therewith, the efficiency and the pulse duration of lasers on rare gas fluorides and VUV F2* laser parameters under REP DD excitation are comparable with those obtained in suitable transverse discharges. The results allow the conclusion that the REP DD homogeneity in mixtures with F2 and SF6 is high enough for attaining high laser efficiency.

  8. Production of high-power CW UV by resonant frequency quadrupling of a Nd:YLF laser

    Energy Technology Data Exchange (ETDEWEB)

    Kuczewski, A.J.; Thorn, C.E. [Brookhaven National Lab., Upton, NY (United States). Dept. of Physics; Matone, G.; Giordano, G. [INFN-Lab. Natzionali di Frascati (Italy)

    1999-06-01

    The authors have constructed a single ring to resonantly double an 18 watt Nd:YLF mode-locked laser and re-double the stored green to produce over 4 watts of power in the ultra-violet (UV). This laser is used to produce a beam of 470 MeV gamma-rays by Compton backscattering the laser beam from 2.8 GeV electrons stored in a synchrotron. Achieving high luminosity of the colliding beams requires very good mode quality and beam stability at the intersection point 22 meters from the laser. The ring consists of six mirrors, with two 25 cm radius of curvature mirrors enclosing each nonlinear crystal. The drive laser is a lamp-pumped Nd:YLF with a 50 ps bunch length at 76 MHz. A pointing stabilizer servo has been constructed as part of the infrared (IR) mode matching telescope. The IR to green conversion is accomplished in a 15 mm long non-critically phased matched LBO crystal located at a 40 micron waist, with an IR conversion efficiency of 70%. A stable, nearly diffraction limited UV beam of up to 4.2 watts is generated in a BBO crystal in the green storage ring. The output power is relatively independent of the efficiency of the LBO and BBO crystals. This fact makes it possible to reduce the amount of non-TEM{sub 00} modes created by walk-off of the UV by using relatively thin BBO crystals. At present, however, the lower bound on the BBO thickness is limited by the loss of conversion efficiency at high power.

  9. Direct synthesis of graphitic mesoporous carbon from green phenolic resins exposed to subsequent UV and IR laser irradiations

    Science.gov (United States)

    Sopronyi, Mihai; Sima, Felix; Vaulot, Cyril; Delmotte, Luc; Bahouka, Armel; Matei Ghimbeu, Camelia

    2016-12-01

    The design of mesoporous carbon materials with controlled textural and structural features by rapid, cost-effective and eco-friendly means is highly demanded for many fields of applications. We report herein on the fast and tailored synthesis of mesoporous carbon by UV and IR laser assisted irradiations of a solution consisting of green phenolic resins and surfactant agent. By tailoring the UV laser parameters such as energy, pulse repetition rate or exposure time carbon materials with different pore size, architecture and wall thickness were obtained. By increasing irradiation dose, the mesopore size diminishes in the favor of wall thickness while the morphology shifts from worm-like to an ordered hexagonal one. This was related to the intensification of phenolic resin cross-linking which induces the reduction of H-bonding with the template as highlighted by 13C and 1H NMR. In addition, mesoporous carbon with graphitic structure was obtained by IR laser irradiation at room temperature and in very short time periods compared to the classical long thermal treatment at very high temperatures. Therefore, the carbon texture and structure can be tuned only by playing with laser parameters, without extra chemicals, as usually required.

  10. Characterization of inorganic species in coal by laser-induced breakdown spectroscopy using UV and IR radiations

    Energy Technology Data Exchange (ETDEWEB)

    Mateo, M.P. [Universidad de A Coruna, Departamento de Ingenieria Industrial II, E-15403 Ferrol (A Coruna) (Spain)], E-mail: pazmateo@udc.es; Nicolas, G.; Yanez, A. [Universidad de A Coruna, Departamento de Ingenieria Industrial II, E-15403 Ferrol (A Coruna) (Spain)

    2007-12-15

    In this work, the capability of laser-induced breakdown spectroscopy for process control in a thermal power plant is presented through quantitative compositional characterization of the coal used for combustion. Laser-induced emission signal of seven samples with a range of concentrations was calibrated for quantification purposes. The eighth sample was subsequently analyzed five times as unknown in order to determine the precision and accuracy of the measurements. Two modes of operation, dynamic and static and two laser wavelengths, 1064 nm and 355 nm were employed in this study for comparison. The results revealed that UV wavelength provided better results than IR radiation in terms of accuracy for the quantification of inorganic species in coal after the comparison with conventional atomic absorption spectrometry characterization.

  11. Characterization of a UV VUV light source based on a gas-target ns-laser-produced plasma

    Science.gov (United States)

    Di Palma, Tonia M.; Borghese, Antonio

    2007-01-01

    We report measurements of the temporal and spatial evolution of plasmas, produced on gaseous targets by focused ns-Nd:YAG laser. Characterization of the UV-VUV light source includes time-resolved visualization of the spatial growth and the spectroscopic signatures of plasmas produced on pulsed, supersonic jets of helium, argon, nitrogen and xenon gases into a vacuum chamber. Photon fluxes of up to 1012 photons cm-2 nm-1/pulse have been measured in the wavelength region 100-260 nm within the first 30 ns following the laser pulse. Also discussed for comparison are plasma signatures in helium, argon and nitrogen gases at standard temperature and pressure. The results indicate availability of photon fluxes, at typical laser repetition rates, that are at least one order of magnitude higher than those achieved from commercial c.w. lamp light sources.

  12. Dependence of adhesion strength between GaN LEDs and sapphire substrate on power density of UV laser irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Park, Junsu [Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of); Sin, Young-Gwan [Department of Nano-Mechatronics, Korea University of Science and Technology (UST), 217 Gajeong-Ro, Yuseong-Gu, Daejeon 34113 (Korea, Republic of); Kim, Jae-Hyun [Department of Nano-Mechanics, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of); Kim, Jaegu, E-mail: gugu99@kimm.re.kr [Department of Nano-Manufacturing Technology, Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 34103 (Korea, Republic of)

    2016-10-30

    Highlights: • Fundamental relationship between laser irradiation and adhesion strength, between gallium-nitride light emitted diode and sapphire substrate, is proposed during selective laser lift-off. • Two competing mechanisms affect adhesion at the irradiated interface between the GaN LED and sapphire substrate. • Ga precipitation caused by thermal decomposition and roughened interface caused by thermal damage lead to the considerable difference of adhesion strength at the interface. - Abstract: Selective laser lift-off (SLLO) is an innovative technology used to manufacture and repair micro-light-emitting diode (LED) displays. In SLLO, laser is irradiated to selectively separate micro-LED devices from a transparent sapphire substrate. The light source used is an ultraviolet (UV) laser with a wavelength of 266 nm, pulse duration of 20 ns, and repetition rate of 30 kHz. Controlled adhesion between a LED and the substrate is key for a SLLO process with high yield and reliability. This study examined the fundamental relationship between adhesion and laser irradiation. Two competing mechanisms affect adhesion at the irradiated interface between the GaN LED and sapphire substrate: Ga precipitation caused by the thermal decomposition of GaN and roughened interface caused by thermal damage on the sapphire. The competition between these two mechanisms leads to a non-trivial SLLO condition that needs optimization. This study helps understand the SLLO process, and accelerate the development of a process for manufacturing micro-LED displays via SLLO for future applications.

  13. Excitation of high-radial-order Laguerre–Gaussian modes in a solid-state laser using a lower-loss digitally controlled amplitude mask

    Science.gov (United States)

    Bell, T.; Hasnaoui, A.; Ait-Ameur, K.; Ngcobo, S.

    2017-10-01

    In this paper we experimentally demonstrate selective excitation of high-radial-order Laguerre–Gaussian (LG p or LG{}p,0) modes with radial order p = 1–4 and azimuthal order l = 0 using a diode-pump solid-state laser (DPSSL) that is digitally controlled by a spatial light modulator (SLM). We encoded an amplitude mask containing p-absorbing rings, of various incompleteness (segmented) on grey-scale computer-generated digital holograms, and displayed them on an SLM which acted as an end mirror of the diode-pumped solid-state digital laser. The various incomplete (α) p-absorbing rings were digitally encoded to match the zero-intensity nulls of the desired LG p mode. We show that the creation of LG p , for p = 1 to p = 4, only requires an incomplete circular p-absorbing ring that has a completeness of ≈37.5%, giving the DPSSL resonator a lower pump threshold power while maintaining the same laser characteristics (such as beam propagation properties).

  14. Effect of selective area growth mask width on multi-quantum-well electroabsorption modulated lasers investigated by synchrotron radiation X-ray microprobe

    Energy Technology Data Exchange (ETDEWEB)

    Mino, Lorenzo, E-mail: lorenzo.mino@unito.it [Department of Inorganic, Materials and Physical Chemistry, NIS Centre of Excellence and INSTM Unit, University of Turin, Via P. Giuria 7, I-10125 Turin (Italy); Agostino, Angelo [Department of General and Organic Chemistry, NIS Centre of Excellence, University of Turin, C.so Massimo D' Azeglio 48, I-10125 Turin (Italy); Codato, Simone [Avago Technologies Italy S.r.l., Torino Technology Centre, Via G. Schiaparelli 12, 10148 Turin (Italy); Martinez-Criado, Gema [ESRF, 6 rue Jules Horowitz, BP220, F-38043 Grenoble CEDEX (France); Lamberti, Carlo [Department of Inorganic, Materials and Physical Chemistry, NIS Centre of Excellence and INSTM Unit, University of Turin, Via P. Giuria 7, I-10125 Turin (Italy)

    2012-08-01

    High performance optoelectronic devices require monolithic integration of different functions at chip level. This is the case of multi-quantum well (MQW) electroabsorption modulated laser (EML), employed in long-distance, high-frequency optical fiber communication applications, which is realized exploiting the selective area growth (SAG) technique. Optimization of the growth parameters is carried out by empirical approaches since a direct characterization of the MQW is not possible with laboratory X-ray sources, owing to the micrometer-variation of composition and thickness inherent to the SAG technique. In this work we combined micrometer-resolved photoluminescence with synchrotron radiation micrometer-resolved X-ray fluorescence to study the effect of different SAG masks on the electronic properties and chemical composition of the SAG MQW EML device.

  15. PRODUCTION OF HIGH-POWER CW UV BY RESONANT FREQUENCY QUADRUPLING OF A ND:YLF LASER.

    Energy Technology Data Exchange (ETDEWEB)

    KUCZEWSKI,A.J.

    1999-01-28

    We have constructed a single ring to resonantly double an 18 watt Nd:YLF mode-locked laser and re-double the stored green to produce over 4 watts of power in the ultra-violet (UV). This laser is used to produce a beam of 470 MeV gamma-rays by Compton backscattering the laser beam from 2.8 GeV electrons stored in a synchrotron. Achieving high luminosity of the colliding beams requires very good mode quality and beam stability at the intersection point 22 meters from the laser. The ring consists of six mirrors, with two 25 cm radius of curvature mirrors enclosing each nonlinear crystal. The drive laser is a lamp pumped Nd:YLF with a 50 ps bunch length at 76 MHz. A pointing stabilizer servo has been constructed as part of the infrared (IR) mode matching telescope. The IR to green conversion is accomplished in a 15 mm long non-critically phased matched LB0 crystal located at a 40 micron waist, with an IR conversion efficiency of 70%. A stable, nearly diffraction limited W beam of up to 4.2 watts is generated in a BBO crystal in the green storage ring. The output power is relatively independent of the efficiency of the LB0 and BBO crystals. This fact makes it possible to reduce the amount of non-TEM{sub 00} modes created by walk-off of the UV by using relatively thin BBO crystals. At present, however, the lower bound on the BBO thickness is limited by the loss of conversion efficiency at high power.

  16. UV-laser treatment of nanodiamond seeds—a valuable tool for modification of nanocrystalline diamond films properties

    Science.gov (United States)

    Vlček, J.; Fitl, P.; Vrňata, M.; Fekete, L.; Taylor, A.; Fendrych, F.

    2013-01-01

    This work aimed to study the UV-laser treatment of precursor (i.e. nanodiamond (ND) seeds on silicon substrates) and its influence on the properties of grown nanocrystalline diamond (NCD) films. Pulsed Nd : YAG laser operating at the fourth harmonic frequency (laser fluence EL = 250 mJ cm-2, pulse duration 5 ns) was used as a source, equipped with an optical system for focusing laser beam onto the sample, allowing exposure of a local spot and horizontal patterning. The variable parameters were: number of pulses (from 5 to 400) and the working atmosphere (He, Ar and O2). Ablation and/or graphitization of seeded nanodiamond particles were observed. Further the microwave plasma-enhanced chemical vapour deposition was employed to grow NCD films on exposed and non-exposed areas of silicon substrates. The size, shape and density distribution of laser-treated nanodiamond seeds were observed by atomic force microscopy (AFM) and their chemical composition by x-ray photoelectron spectroscopy (XPS) analysis. The resulting NCD films (uniform thickness of 400 nm) were characterized by: Raman spectroscopy to analyse occurrence of graphitic phase, and AFM to observe morphology and surface roughness. The highest RMS roughness (˜85 nm) was achieved when treating the precursor in He atmosphere. Horizontal microstructures of diamond films were fabricated.

  17. Synthesis of binary iron-carbon nanoparticles by UV laser photolysis of Fe(CO)5 with various hydrocarbons

    Science.gov (United States)

    Eremin, A. V.; Gurentsov, E. V.; Musikhin, S. A.

    2016-10-01

    In this study the laser photolysis of the mixtures containing vapors of various hydrocarbons and iron pentacarbonyl was implemented to nanoparticle formation. The radiation source used for photo-dissociation of precursors was a pulsed Nd:Yag laser operated at a wavelength of 266 nm. Under UV radiation the molecules of Fe(CO)5 decomposed, forming atomic iron vapor and unsaturated carbonyls at well-known and readily controllable parameters. The subsequent condensation of supersaturated metal vapor resulted in small iron clusters and nanoparticles formation. The growth process of the nanoparticles was observed by a method of laser light extinction. Laser induced incandescence technique was applied for particle sizing during the process of their formation. Additionally nanoparticle samples were investigated by a transmission electron microscope. The particle size distribution was measured by statistical treatment of microphotographs. The elemental analysis by energy-dispersive x-ray spectroscopy and electron diffraction pattern gave the composition and structure of nanoparticles. The core-shell iron-carbon nanoparticles were synthesized by joint laser photolysis of iron pentacarbonyl with benzene and acetylene. The photolysis of the mixtures of toluene, butanol and methane with iron pentacarbonyl revealed in a pure iron particles formation which fast oxidized in air when were extracted out of the reactor.

  18. A Feasibility Study of UV Laser Assisted 3D-Atom Probe Analysis of AlGaN/GaN HEMTs

    Science.gov (United States)

    2013-03-05

    Final Report for AOARD Grant-FA2386-11-1-4031 “A feasibility study of UV laser assisted 3D-atom probe analysis of AlGaN/ GaN HEMTs ” March 5...20-06-2011 to 19-06-2012 4. TITLE AND SUBTITLE A feasibility study of UV laser assisted 3D-atom probe analysis of AlGaN/ GaN HEMTs 5a. CONTRACT...gate region (gate metal, interfacial layer and defects, and AlGaN/ GaN epilayers) of an AFRL HEMT using laser assisted 3-D atom probe (3DAP

  19. Development and Quantification of UV-Visible and Laser Spectroscopic Techniques for Materials Accountability and Process Control

    Energy Technology Data Exchange (ETDEWEB)

    Ken Czerwinski; Phil Weck; Frederic Poineau

    2010-12-29

    Ultraviolet-Visible Spectroscopy (UV-Visible) and Time Resolved Laser Fluorescence Spectroscopy (TRLFS) optical techniques can permit on-line, real-time analysis of the actinide elements in a solvent extraction process. UV-Visible and TRLFS techniques have been used for measuring the speciation and concentration of the actinides under laboratory conditions. These methods are easily adaptable to multiple sampling geometries, such as dip probes, fiber-optic sample cells, and flow-through cell geometries. To fully exploit these techniques for GNEP applications, the fundamental speciation of the target actinides and the resulting influence on 3 spectroscopic properties must be determined. Through this effort detection limits, process conditions, and speciation of key actinide components can be establish and utilized in a range of areas of interest to GNEP, especially in areas related to materials accountability and process control.

  20. Utilization of the UV laser with picosecond pulses for the formation of surface microstructures on elastomeric plastics

    Science.gov (United States)

    Antoszewski, B.; Tofil, S.; Scendo, M.; Tarelnik, W.

    2017-08-01

    Elastomeric plastics belong to a wide range of polymeric materials with special properties. They are used as construction material for seals and other components in many branches of industry and, in particular, in the biomedical industry, mechatronics, electronics and chemical equipment. The micromachining of surfaces of these materials can be used to build micro-flow, insulating, dispensing systems and chemical and biological reactors. The paper presents results of research on the effects of micro-machining of selected elastomeric plastics using a UV laser emitting picosecond pulses. The authors see the prospective application of the developed technology in the sealing technique in particular to shaping the sealing pieces co-operating with the surface of the element. The result of the study is meant to show parameters of the UV laser’s performance when producing typical components such as grooves, recesses for optimum ablation in terms of quality and productivity.

  1. Mw Spectroscopy Coupled with Ultrafast UV Laser Vaporization: {RIBOSE} Found in the Gas Phase

    Science.gov (United States)

    Cocinero, Emilio J.; Ecija, Patricia; Basterretxea, Francisco J.; Fernandez, Jose A.; Castano, Fernando; Lesarri, Alberto; Grabow, Jens-Uwe

    2012-06-01

    Sugars are aldoses or ketoses with multiple hydroxy groups which have been elusive to spectroscopic studies. Here we report a rotational study of the aldopentose ribose. According to any standard textbook aldopentoses can exhibit either linear forms, cyclic five-membered (furanose) structures or six-membered (pyranose) rings, occurring either as α- or β- anomers depending on the orientation of the hydroxy group at C-1 (anomeric carbon). β-Furanose is predominant in ribonucleosides, RNA, ATP and other biochemically relevant derivatives, but is β-furanose the native form also of free ribose? Recent condensed-phase X-ray and older NMR studies delivered conflicting results. In order to solve this question we conducted a microwave study on D-ribose that, owing to ultrafast UV laser vaporization, has become the first C-5 sugar observed with rotational resolution. The spectrum revealed six conformations of free ribose, preferentially adopting β-pyranose chairs as well as higher-energy α-pyranose forms. The method also allowed for unambiguous distinction between different orientations of the hydroxy groups, which stabilize the structures by cooperative hydrogen-bond networks. No evidence was observed of the α-/β-furanoses or linear forms found in the biochemical derivatives. i) D. Šišak, L. B. McCusker, G. Zandomeneghi, B. H. Meier, D. Bläser, R. Boese, W. B. Schweizer, R. Gylmour and J. D. Dunitz Angew. Chem. Int. Ed. 49, 4503, 2010. ii) W. Saenger Angew. Chem. Int. Ed. 49, 6487, 2010. i) M. Rudrum, and D. F. Shaw, J. Chem. Soc. 52, 1965. ii) R. U. Lemieux and J. D. Stevens Can. J. Chem. 44, 249, 1966. iii) E. Breitmaier and U. Hollstein Org. Magn. Reson. 8, 573, 1976. E. J. Cocinero, A. Lesarri, P. Écija, F. J. Basterretxea, J. U. Grabow, J. A. Fernández and F. Castaño Angew. Chem. Int. Ed. in press: DOI: 10.1002/anie.201107973, 2012.

  2. Development of a X-UV Michelson interferometer for probing laser produced plasmas with a X-ray laser

    Energy Technology Data Exchange (ETDEWEB)

    Hubert, S. [Paris-Sud Univ., Orsay (France). LSAI; CEA Centre d' Etudes de Bruyeres-le-Chatel, 91 (France). DAM/CEB.3/ODIR; Zeitoun, Ph.; Vanbostal, L.; Carillon, A.; Fourcade, P.; Idir, M.; Pape, S. le; Ros, D.; Jamelot, G. [Paris-Sud Univ., Orsay (France). LSAI; Bechir, E. [CEA Centre d' Etudes de Bruyeres-le-Chatel, 91 (France). DAM/CEB.3/ODIR; Delmotte, F.; Ravet, M.F. [IOTA, Univ. Paris-Sud, Orsay (France)

    2001-07-01

    We have developed and used a soft X-ray Michelson interferometer to probe large laser-produced plasmas. The aim investigated is to obtain electron density profiles and thus important informations on the plasma dynamic. This paper describes our design and presents some preliminary results using a nickel-like X-ray laser operating at 13.9 nm. We present numericals results which show the interest of using X-ray laser to probe laser-produced plasma by interferometry. (orig.)

  3. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  4. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  5. A prototype liquid Argon Time Projection Chamber for the study of UV laser multi-photonic ionization

    CERN Document Server

    Rossi, B; Ereditato, A; Haug, S; Hanni, R; Hess, M; Janos, S; Juget, F; Kreslo, I; Lehmann, S; Lutz, P; Mathieu, R; Messina, M; Moser, U; Nydegger, F; Schutz, H U; Weber, M S; Zeller, M

    2009-01-01

    This paper describes the design, realization and operation of a prototype liquid Argon Time Projection Chamber (LAr TPC) detector dedicated to the development of a novel online monitoring and calibration system exploiting UV laser beams. In particular, the system is intended to measure the lifetime of the primary ionization in LAr, in turn related to the LAr purity level. This technique could be exploited by present and next generation large mass LAr TPCs for which monitoring of the performance and calibration plays an important role. Results from the first measurements are presented together with some considerations and outlook.

  6. Novel Compact Solid-State UV Laser for Ozone DIAL Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Q-Peak proposes to develop a compact, high-repetition rate, dual-line UV source based on the combination of an innovative, efficient, high-energy, single-frequency,...

  7. Studies of high repetition rate laser-produced plasma soft-X-ray amplifiers; Etudes d'amplificateurs plasma laser a haute cadence dans le domaine X-UV et applications

    Energy Technology Data Exchange (ETDEWEB)

    Cassou, K

    2006-12-15

    The progress made as well on the Ti:Sa laser system, as in the control and the knowledge of laser produced X-UV sources allowed the construction of a X-UV laser station dedicated to the applications. My thesis work falls under the development of this station and more particularly on the characterization of a X-UV laser plasma amplifier. The experimental study relates to the coupling improvement of the pump infra-red laser with plasma within the framework of the transient collisional X-UV laser generation. These X-UV lasers are generated in a plasma formed by the interaction of a solid target and a laser pulse of approximately 500 ps duration, followed by a second infra-red laser pulse known as of pump (about 5 ps) impinging on the target in grazing incidence. For the first time, a complete parametric study was undertaken on the influence of the grazing angle on the pumping of the amplifying medium. One of the results was to reach very high peak brightness about 10{sup 28} ph/s/mm{sup 2}/mrad{sup 2}/(0.1%bandwidth), which compares well with the free-electron laser brightness. Moreover, we modified then used a new two-dimensional hydrodynamic code with adaptive mesh refinement in order to understand the influence of the space-time properties of the infra-red laser on the formation and the evolution of the amplifying plasma. Our modeling highlighted the interest to use a super Gaussian transverse profile for the line focus leading to an increase in a factor two of the gain region size and a reduction of the electron density gradient by three orders of magnitude. These improvements should strongly increase the energy contained in X-UV laser beam. We thus used X-UV laser to study the appearance of transient defects produced by a laser IR on a beam-splitter rear side. We also began research on the mechanisms of DNA damage induced by a very intense X-UV radiation. (author)

  8. A combination of He-Ne laser irradiation and exogenous NO application efficiently protect wheat seedling from oxidative stress caused by elevated UV-B stress.

    Science.gov (United States)

    Li, Yongfeng; Gao, Limei; Han, Rong

    2016-12-01

    The elevated ultraviolet-B (UV-B) stress induces the accumulation of a variety of intracellular reactive oxygen species (ROS), which seems to cause oxidative stress for plants. To date, very little work has been done to evaluate the biological effects of a combined treatment with He-Ne laser irradiation and exogenous nitric oxide (NO) application on oxidative stress resulting from UV-B radiation. Thus, our study investigated the effects of a combination with He-Ne laser irradiation and exogenous NO treatment on oxidative damages in wheat seedlings under elevated UV-B stress. Our data showed that the reductions in ROS levels, membrane damage parameters, while the increments in antioxidant contents and antioxidant enzyme activity caused by a combination with He-Ne laser and exogenous NO treatment were greater than those of each individual treatment. Furthermore, these treatments had a similar effect on transcriptional activities of plant antioxidant enzymes. This implied that the protective effects of a combination with He-Ne laser irradiation and exogenous NO treatment on oxidative stress resulting from UV-B radiation was more efficient than each individual treatment with He-Ne laser or NO molecule. Our findings might provide beneficial theoretical references for identifying some effective new pathways for plant UV-B protection.

  9. Laser capture microdissection: Arcturus(XT) infrared capture and UV cutting methods.

    Science.gov (United States)

    Gallagher, Rosa I; Blakely, Steven R; Liotta, Lance A; Espina, Virginia

    2012-01-01

    Laser capture microdissection (LCM) is a technique that allows the precise procurement of enriched cell populations from a heterogeneous tissue under direct microscopic visualization. LCM can be used to harvest the cells of interest directly or can be used to isolate specific cells by ablating the unwanted cells, resulting in histologically enriched cell populations. The fundamental components of laser microdissection technology are (a) visualization of the cells of interest via microscopy, (b) transfer of laser energy to a thermolabile polymer with either the formation of a polymer-cell composite (capture method) or transfer of laser energy via an ultraviolet laser to photovolatize a region of tissue (cutting method), and (c) removal of cells of interest from the heterogeneous tissue section. Laser energy supplied by LCM instruments can be infrared (810 nm) or ultraviolet (355 nm). Infrared lasers melt thermolabile polymers for cell capture, whereas ultraviolet lasers ablate cells for either removal of unwanted cells or excision of a defined area of cells. LCM technology is applicable to an array of applications including mass spectrometry, DNA genotyping and loss-of-heterozygosity analysis, RNA transcript profiling, cDNA library generation, proteomics discovery, and signal kinase pathway profiling. This chapter describes the unique features of the Arcturus(XT) laser capture microdissection instrument, which incorporates both infrared capture and ultraviolet cutting technology in one instrument, using a proteomic downstream assay as a model.

  10. Initiation, Growth and Mitigation of UV Laser Induced Damage in Fused Silica

    Energy Technology Data Exchange (ETDEWEB)

    Rubenchik, A M; Feit, M D

    2001-12-21

    Laser damage of large fused silica optics initiates at imperfections. Possible initiation mechanisms are considered. We demonstrate that a model based on nanoparticle explosions is consistent with the observed initiation craters. Possible mechanisms for growth upon subsequent laser irradiation, including material modification and laser intensification, are discussed. Large aperture experiments indicate an exponential increase in damage size with number of laser shots. Physical processes associated with this growth and a qualitative explanation of self-accelerated growth is presented. Rapid growth necessitates damage growth mitigation techniques. Several possible mitigation techniques are mentioned, with special emphasis on CO{sub 2} processing. Analysis of material evaporation, crack healing, and thermally induced stress are presented.

  11. Initiation, Growth and Mitigation of UV Laser Induced Damage in Fused Silica

    Energy Technology Data Exchange (ETDEWEB)

    Rubenchik, A M; Feit, M D

    2003-06-10

    Laser damage of large fused silica optics initiates at imperfections. Possible initiation mechanisms are considered. We demonstrate that a model based on nanoparticle explosions is consistent with the observed initiation craters. Possible mechanisms for growth upon subsequent laser irradiation, including material modification and laser intensification, are discussed. Large aperture experiments indicate an exponential increase in damage size with number of laser shots. Physical processes associated with this growth and a qualitative explanation of self-accelerated growth is presented. Rapid growth necessitates damage growth mitigation techniques. Several possible mitigation techniques are mentioned, with special emphasis on CO{sub 2} processing. Analysis of material evaporation, crack healing, and thermally induced stress are presented.

  12. Optical injection and spectral filtering of high-power UV laser diodes

    CERN Document Server

    Schäfer, V M; Tock, C J; Lucas, D M

    2015-01-01

    We demonstrate injection-locking of 120mW laser diodes operating at 397nm. We achieve stable operation with injection powers of ~100uW and a slave laser output power of up to 110mW. We investigate the spectral purity of the slave laser light via photon scattering experiments on a single trapped Ca40 ion. We show that it is possible to achieve a scattering rate indistinguishable from that of monochromatic light by filtering the laser light with a diffraction grating to remove amplified spontaneous emission.

  13. Dependence of adhesion strength between GaN LEDs and sapphire substrate on power density of UV laser irradiation

    Science.gov (United States)

    Park, Junsu; Sin, Young-Gwan; Kim, Jae-Hyun; Kim, Jaegu

    2016-10-01

    Selective laser lift-off (SLLO) is an innovative technology used to manufacture and repair micro-light-emitting diode (LED) displays. In SLLO, laser is irradiated to selectively separate micro-LED devices from a transparent sapphire substrate. The light source used is an ultraviolet (UV) laser with a wavelength of 266 nm, pulse duration of 20 ns, and repetition rate of 30 kHz. Controlled adhesion between a LED and the substrate is key for a SLLO process with high yield and reliability. This study examined the fundamental relationship between adhesion and laser irradiation. Two competing mechanisms affect adhesion at the irradiated interface between the GaN LED and sapphire substrate: Ga precipitation caused by the thermal decomposition of GaN and roughened interface caused by thermal damage on the sapphire. The competition between these two mechanisms leads to a non-trivial SLLO condition that needs optimization. This study helps understand the SLLO process, and accelerate the development of a process for manufacturing micro-LED displays via SLLO for future applications.

  14. Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers.

    Science.gov (United States)

    Ye, Hui; Li, Yaguo; Zhang, Qinghua; Wang, Wei; Yuan, Zhigang; Wang, Jian; Xu, Qiao

    2016-04-10

    HF-based (hydrofluoric acid) chemical etching has been a widely accepted technique to improve the laser damage performance of fused silica optics and ensure high-power UV laser systems at designed fluence. Etching processes such as acid concentration, composition, material removal amount, and etching state (etching with additional acoustic power or not) may have a great impact on the laser-induced damage threshold (LIDT) of treated sample surfaces. In order to find out the effects of these factors, we utilized the Taguchi method to determine the etching conditions that are helpful in raising the LIDT. Our results show that the most influential factors are concentration of etchants and the material etched away from the viewpoint of damage performance of fused silica optics. In addition, the additional acoustic power (∼0.6  W·cm-2) may not benefit the etching rate and damage performance of fused silica. Moreover, the post-cleaning procedure of etched samples is also important in damage performances of fused silica optics. Different post-cleaning procedures were, thus, experiments on samples treated under the same etching conditions. It is found that the "spraying + rinsing + spraying" cleaning process is favorable to the removal of etching-induced deposits. Residuals on the etched surface are harmful to surface roughness and optical transmission as well as laser damage performance.

  15. Final LDRD report : science-based solutions to achieve high-performance deep-UV laser diodes.

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, Andrew M.; Miller, Mary A.; Crawford, Mary Hagerott; Alessi, Leonard J.; Smith, Michael L.; Henry, Tanya A.; Westlake, Karl R.; Cross, Karen Charlene; Allerman, Andrew Alan; Lee, Stephen Roger

    2011-12-01

    We present the results of a three year LDRD project that has focused on overcoming major materials roadblocks to achieving AlGaN-based deep-UV laser diodes. We describe our growth approach to achieving AlGaN templates with greater than ten times reduction of threading dislocations which resulted in greater than seven times enhancement of AlGaN quantum well photoluminescence and 15 times increase in electroluminescence from LED test structures. We describe the application of deep-level optical spectroscopy to AlGaN epilayers to quantify deep level energies and densities and further correlate defect properties with AlGaN luminescence efficiency. We further review our development of p-type short period superlattice structures as an approach to mitigate the high acceptor activation energies in AlGaN alloys. Finally, we describe our laser diode fabrication process, highlighting the development of highly vertical and smooth etched laser facets, as well as characterization of resulting laser heterostructures.

  16. A comparison of the DPSS UV laser ablation characteristic of 1024 and H10F WC-Co

    Science.gov (United States)

    See, Tian Long; Chantzis, Dimitrios; Royer, Raphael; Metsios, Ioannis; Antar, Mohammad; Marimuthu, Sundar

    2017-07-01

    An investigation on ablation characteristics of 1024 and H10F cobalt cemented tungsten carbide (WC-Co) with a DPSS nanosecond UV laser (50 ns pulse width, 355 nm wavelength, 90 W average power and 10 kHz repetition rate) is presented. The ablation characteristic parameters such as ablation threshold, incubation effect and optical penetration depth were evaluated based on the spot ablation diameter and depth. It was observed that the ablation threshold is significantly influenced by the number of pulses (NOP) and it decreases with increase NOP which is attributed to the incubation effect. Only one ablation region is observed at low laser fluence and an additional molten ablation region is observed at high laser fluence accompanied with cracks. The cracks formation is due to the thermal induced stress and changes in WC microstructure during laser beam irradiation. The crack depth is proportional to the thickness of the molten WC region. The ablation threshold of 1024 WC-Co and H10F WC-Co were found to be Fth1 =4.32 J/cm2 and Fth1 =4.26 J/cm2 respectively. The difference in chemical composition has insignificant effect on the ablation threshold value of the material. The incubation factor and optical penetration depth values of 1024 WC-Co and H10F WC-Co were found to be ξ=0.73, α-1 =411 nm and ξ=0.75, α-1 =397 nm respectively.

  17. Ionizations and fragmentations of benzene, methylbenzene, and chlorobenzene in strong IR and UV laser fields

    Institute of Scientific and Technical Information of China (English)

    张军峰; 吕航; 左万龙; 徐海峰; 金明星; 丁大军

    2015-01-01

    Ionizations and fragmentations of benzene, methylbenzene, and chlorobenzene are studied in linearly polarized 50-fs, 800-nm and 400-nm strong laser fields using a time-of-flight mass spectrometer. It is shown that at low laser intensity, the parent ions are dominant for any one of the molecules in an 800-nm strong laser field, while extensive fragmentation is observed in a 400-nm laser field, which can be understood by the resonant photon absorption of molecular cations. The ratio of the yield of the parent ion to the yield of the total ion for each molecule is measured as a function of laser intensity in a range from 1.01013 W/cm2 to 4.01014 W/cm2, in either the 800-nm or 400-nm laser field. The results show that the fragmentation of the aromatic molecules increases significantly as the laser intensity is increased. Possible mechanisms for fragmentation in strong laser fields are discussed. Finally, the saturation intensity of ionization of the titled molecules is also determined.

  18. Mask-free, vacuum-free fabrication of high-conductivity metallic nanowire by spatially shaped ultrafast laser (Conference Presentation)

    Science.gov (United States)

    Wang, Andong; Li, Xiaowei; Qu, Lianti; Lu, Yongfeng; Jiang, Lan

    2017-03-01

    Metal nanowire fabrication has drawn tremendous attention in recent years due to its wide application in electronics, optoelectronics, and plasmonics. However, conventional laser fabrication technologies are limited by diffraction limit thus the fabrication resolution cannot meet the increasingly high demand of modern devices. Herein we report on a novel method for high-resolution high-quality metal nanowire fabrication by using Hermite-Gaussian beam to ablate metal thin film. The nanowire is formed due to the intensity valley in the center of the laser beam while the surrounding film is ablated. Arbitrary nanowire can be generated on the substrate by dynamically adjusting the orientation of the intensity valley. This method shows obvious advantages compared to conventional methods. First, the minimum nanowire has a width of 60 nm (≍1/13 of the laser wavelength), which is much smaller than the diffraction limit. The high resolution is achieved by combining the ultrashort nature of the femtosecond laser and the low thermal conductivity of the thin film. In addition, the fabricated nanowires have good inside qualities. No inner nanopores and particle intervals are generated inside the nanowire, thus endowing the nanowire with good electronic characteristics: the conductivity of the nanowires is as high as 1.2×107 S/m (≍1/4 of buck material), and the maximum current density is up to 1.66×108 A/m2. Last, the nanowire has a good adhesion to the substrates, which can withstand ultrasonic bath for a long time. These advantages make our method a good approach for high-resolution high-quality nanowire fabrication as a complementary method to conventional lithography methods.

  19. Narrow linewidth picosecond UV pulsed laser with mega-watt peak power.

    Science.gov (United States)

    Huang, Chunning; Deibele, Craig; Liu, Yun

    2013-04-08

    We demonstrate a master oscillator power amplifier (MOPA) burst mode laser system that generates 66 ps/402.5 MHz pulses with mega-watt peak power at 355 nm. The seed laser consists of a single frequency fiber laser (linewidth picosecond pulse generator, and a fiber based preamplifier. A very high extinction ratio (45 dB) has been achieved by using an adaptive bias control of the EOM. The multi-stage Nd:YAG amplifier system allows a uniformly temporal shaping of the macropulse with a tunable pulse duration. The light output from the amplifier is converted to 355 nm, and over 1 MW peak power is obtained when the laser is operating in a 5-μs/10-Hz macropulse mode. The laser output has a transform-limited spectrum with a very narrow linewidth of individual longitudinal modes. The immediate application of the laser system is the laser-assisted hydrogen ion beam stripping for the Spallation Neutron Source (SNS).

  20. Enhanced UV photoresponse of KrF-laser-synthesized single-wall carbon nanotubes/n-silicon hybrid photovoltaic devices.

    Science.gov (United States)

    Le Borgne, V; Gautier, L A; Castrucci, P; Del Gobbo, S; De Crescenzi, M; El Khakani, M A

    2012-06-01

    We report on the KrF-laser ablation synthesis, purification and photocurrent generation properties of single-wall carbon nanotubes (SWCNTs). The thermally purified SWCNTs are integrated into hybrid photovoltaic (PV) devices by spin-coating them onto n-Si substrates. These novel SWCNTs/n-Si hybrid devices are shown to generate significant photocurrent (PC) over the entire 250-1050 nm light spectrum with external quantum efficiencies (EQE) reaching up to ~23%. Our SWCNTs/n-Si hybrid devices are not only photoactive in the traditional spectral range of Si solar cells, but generate also significant PC in the UV domain (below 400 nm). This wider spectral response is believed to be the result of PC generation from both the SWCNTs themselves and the tremendous number of local p-n junctions created at the nanotubes/Si interface. To assess the prevalence of these two contributions, the EQE spectra and J-V characteristics of these hybrid devices were investigated in both planar and top-down configurations, as a function of SWCNTs' film thickness. A sizable increase in EQE in the near UV with respect to the silicon is observed in both configurations, with a more pronounced UV photoresponse in the planar mode, confirming thereby the role of SWCNTs in the photogeneration process. The PC generation is found to reach its maximum for an optimal the SWCNT film thickness, which is shown to correspond to the best trade-off between lowest electrical resistance and highest optical transparency. Finally, by analyzing the J-V characteristics of our SWCNTs/n-Si devices with an equivalent circuit model, we were able to point out the contribution of the various electrical components involved in the photogeneration process. The SWCNTs-based devices demonstrated here open up the prospect for their use in highly effective photovoltaics and/or UV-light sensors.

  1. Direct chemical analysis of frozen ice cores by UV-laser ablation ICPMS

    DEFF Research Database (Denmark)

    Müller, Wolfgang; Shelley, J. Michael G.; Rasmussen, Sune Olander

    2011-01-01

    Cryo-cell UV-LA-ICPMS is a new technique for direct chemical analysis of frozen ice cores at high spatial resolution (micrometer). It was tested in a pilot study on NGRIP ice and reveals sea ice/dust records and annual layer signatures at unprecedented spatial/time resolution. Uniquely...

  2. Microstructure variation in fused silica irradiated by different fluence of UV laser pulses with positron annihilation lifetime and Raman scattering spectroscopy

    Science.gov (United States)

    Li, Chunhong; Zheng, Wanguo; Zhu, Qihua; Chen, Jun; Wang, B. Y.; Ju, Xin

    2016-10-01

    We present an original study on the non-destructive evaluation of the microstructure evolution of fused silica induced by pulsed UV laser irradiation at low fluence (less than 50% Fth). Positron annihilation spectroscopy discloses that the spatial size of the vacancy cluster is increased exponentially with the linearly elevated laser fluence. Particularly, the vacancy cluster size in bulk silica is significantly increased by 14.5% after irradiated by pulsed 355 nm laser at F = 14 J/cm2 (50% Fth), while the void size varies only ∼2%. UV laser-excited Raman results suggest that the bond length and average bond angle of Sisbnd Osbnd Si bridging bond are both slightly reduced. Results reveals that the rearrangement process of (Sisbnd O)n fold rings and breakage of the Sisbnd O bridging bond in bulk silica occurred during pulsed UV laser irradiation. The micro-structural changes were taken together to clarify the effect of sub-threshold laser fluence on material stability of silica glass. The obtained data provide important information for studying material stability and controlling the lifetime of fused silica optics for high power laser system.

  3. Enhanced In Situ Sampling Capabilities with a Compact UV Laser System Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A miniaturized, solid-state frequency-quadrupled Nd:YAG laser system  will be tested for performance and mechnically packaged to support future mission-driven...

  4. Escape of carbon element in surface ablation of cobalt cemented tungsten carbide with pulsed UV laser

    Science.gov (United States)

    Li, Tiejun; Lou, Qihong; Dong, Jingxing; Wei, Yunrong; Liu, Jingru

    2001-03-01

    Surface ablation of cobalt cemented tungsten carbide hardmetal has been carried out in this work using a 308 nm, 30 ns XeCl excimer laser. The surface phase transformation on different pulse number of laser shots has been investigated by means of XRD and microphotography as well as AES at laser fluence of 2.5 J/cm 2. The experimental results showed that the phase structure of irradiated area has partly transformed from original WC to β-WC 1- x, then to α-W 2C and CW 3, and finally to W crystal. It is suggested that the formation of non-stoichiometric tungsten carbide should result from the escaping of carbon element due to accumulated heating of surface by pulsed laser irradiation.

  5. Low-level laser therapy: Effects on human face aged skin and cell viability of HeLa cells exposed to UV radiation

    Directory of Open Access Journals (Sweden)

    Mezghani Sana

    2015-01-01

    Full Text Available Chronic and excessive exposure to UV radiation leads to photoaging and photocarcinogenesis. Adequate protection of the skin against the deleterious effects of UV irradiation is essential. Low-level laser therapy (LLLT is a light source in the red to near-infrared range that has been accepted in a variety of medical applications. In this study, we explored the effect of LLLT in human face aged skin and the cell viability of HeLa cells exposed to UV radiation. We found that LLLT significantly reduced visible wrinkles and the loss of firmness of facial skin in aging subjects. Additionally, treatment of cultured HeLa cells with LLLT prior to or post UVA or UVB exposure significantly protected cells from UV-mediated cell death. All results showed the beneficial effects of LLLT on relieving signs of skin aging and its prevention and protection of the cell viability against UV-induced damage.

  6. Phase transformation during surface ablation of cobalt-cemented tungsten carbide with pulsed UV laser

    Energy Technology Data Exchange (ETDEWEB)

    Li, T. [Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Optics and Fine Mechanics; Northwest Institute of Nuclear Technology, Xi' an (China); Lou, Q.; Dong, J.; Wei, Y. [Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Optics and Fine Mechanics; Liu, J. [Northwest Institute of Nuclear Technology, Xi' an (China)

    2001-09-01

    Surface ablation of cobalt-cemented tungsten carbide hard metal has been carried out in this work using a 308 nm, 20 ns XeCl excimer laser. Surface microphotography and XRD, as well as an electron probe have been used to investigate the transformation of phase and microstructure as a function of the pulse-number of laser shots at a laser fluence of 2.5 J/cm{sup 2}. The experimental results show that the microstructure of cemented tungsten carbide is transformed from the original polygonal grains of size 3 {mu}m to interlaced large, long grains with an increase in the number of laser shots up to 300, and finally to gross grains of size 10 {mu}m with clear grain boundaries after 700 shots of laser irradiation. The crystalline structure of the irradiated area is partly transformed from the original WC to {beta}WC{sub 1-x}, then to {alpha}W{sub 2}C and CW{sub 3}, and finally to W crystal. It is suggested that the undulating 'hill-valley' morphology may be the result of selective removal of cobalt binder from the surface layer of the hard metal. The formation of non-stoichiometric tungsten carbide may result from the escape of elemental carbon due to accumulated heating of the surface by pulsed laser irradiation. (orig.)

  7. Phase transformation during surface ablation of cobalt-cemented tungsten carbide with pulsed UV laser

    Science.gov (United States)

    Li, T.; Lou, Q.; Dong, J.; Wei, Y.; Liu, J.

    Surface ablation of cobalt-cemented tungsten carbide hard metal has been carried out in this work using a 308 nm, 20 ns XeCl excimer laser. Surface microphotography and XRD, as well as an electron probe have been used to investigate the transformation of phase and microstructure as a function of the pulse-number of laser shots at a laser fluence of 2.5 J/cm2. The experimental results show that the microstructure of cemented tungsten carbide is transformed from the original polygonal grains of size 3 μm to interlaced large, long grains with an increase in the number of laser shots up to 300, and finally to gross grains of size 10 μm with clear grain boundaries after 700 shots of laser irradiation. The crystalline structure of the irradiated area is partly transformed from the original WC to βWC1-x, then to αW2C and CW3, and finally to W crystal. It is suggested that the undulating `hill-valley' morphology may be the result of selective removal of cobalt binder from the surface layer of the hard metal. The formation of non-stoichiometric tungsten carbide may result from the escape of elemental carbon due to accumulated heating of the surface by pulsed laser irradiation.

  8. UV and IR laser radiation's interaction with metal film and teflon surfaces

    Science.gov (United States)

    Fedenev, A. V.; Alekseev, S. B.; Goncharenko, I. M.; Koval', N. N.; Lipatov, E. I.; Orlovskii, V. M.; Shulepov, M. A.; Tarasenko, V. F.

    2003-04-01

    The interaction of Xe ([lambda] [similar] 1.73 [mu]m) and XeCl (0.308 [mu]m) laser radiation with surfaces of metal and TiN-ceramic coatings on glass and steel substrates has been studied. Correlation between parameters of surface erosion versus laser-specific energy was investigated. Monitoring of laser-induced erosion on smooth polished surfaces was performed using optical microscopy. The correlation has been revealed between characteristic zones of thin coatings damaged by irradiation and energy distribution over the laser beam cross section allowing evaluation of defects and adhesion of coatings. The interaction of pulsed periodical CO2 ([lambda] [similar] 10.6 [mu]m), and Xe ([lambda] [similar] 1.73 [mu]m) laser radiation with surfaces of teflon (polytetrafluoroethylene—PTFE) has been studied. Monitoring of erosion track on surfaces was performed through optical microscopy. It has been shown that at pulsed periodical CO2-radiation interaction with teflon the sputtering of polymer with formation of submicron-size particles occurs. Dependencies of particle sizes, form, and sputtering velocity on laser pulse duration and target temperature have been obtained.

  9. Programmable picosecond pulse packets for micromachining with multiwatt UV fiber lasers

    Science.gov (United States)

    Alekel, Theodore; Foster, David H.; Crist, Jordan

    2009-02-01

    Nanosecond class lasers have been the mainstay of optical machining for decades, delivering pulses with high fluences (>1 J/cm2) that cause many material sets to undergo thermally-induced phase changes to cause removal of matter. While in many cases their delivery of sheer laser power has proved useful, nanosecond lasers have fallen short of addressing current micromachining requirements with respect to decreased feature sizes and more complex substrates. One main issue is the laser pulse width endures throughout the ablation process, depositing energy is deposited into plasma formation and local material heating. Plasma shielding takes place when the laser pulse energy contributes to plasma formation to a greater extent than direct material ablation processes. The result is a crude "plasma cutter" of the substrate, leaving a telltale trail of localized dross and droplet deposition. Nanosecond lasers of sufficient process speeds are typically Q-switched with repetition rates less than 200 kHz. As a result, the scribed lines are made of a sequence of "blast events" that result in a variety of undesired consequences and a limited process speed.

  10. Ultra high resolution cation analysis of NGRIP deep ice via cryo-cell UV-laser-ablation ICPMS

    Science.gov (United States)

    Della Lunga, Damiano; Muller, Wolfgang; Olander Rasmussen, Sune; Svensson, Anders

    2014-05-01

    During glacial periods, Earth experienced abrupt climate change events that led to rapid natural warming/ cooling over a few years only (Steffensen et al., 2008). In order to investigate these rapid climate events especially in old thinned ice, highest spatial/time resolution analysis of climate proxies is required. A recently developed methodology at Royal Holloway University of London (Müller et al., 2011), which permits in situ chemical analysis of frozen ice with spatial (and thus time) resolution up to 0.1 mm (100 ?m) using cryo-cell UV-laser ablation inductively-coupled-plasma mass spectrometry (UV-LA-ICPMS), has been optimized and utilized for analysis of (major) elements indicative of dust and/or sea salt (e.g. Fe, Al, Ca, Mg, Na), while maintaining detection limits in the low(est) ppb-range. NGRIP samples of Greenland Stadial GS22 (~86 ka, depth of ~2690 m), representing a minor δ18O shift (of about ± 4) within the stadial phase of D-O event 22, have been selected and analysed. With a single storm-event resolution capability, seasonal, annual and multiannual periodicity of elements have been identified and will be presented with particular focus on the phasing of the climate proxies. Corresponding results include also an optimized UV-LA-ICPMS methodology, particularly with reference to depth-profiling, assessing contamination of the sample surface and standardization. Finally, the location and distribution of soluble and insoluble micro-inclusions in deep ice have also been assessed concerning the partitioning of elements between grain boundaries and grain interiors. Results show that impurities tend to be concentrated along boundaries in clear (winter) ice, whereas in cloudy bands ('dirtier' ice) they distribute equally between boundaries and interiors. References Müller, W., Shelley, J.M.G., Rasmussen, S.O., 2011. Direct chemical analysis of frozen ice cores by UV-laser ablation ICPMS. J. Anal. At. Spectrom. 26, 2391-2395. Steffensen, J.P., Andersen

  11. Insight to UV-induced formation of laser damage on LiB(3)O(5) optical surfaces during long-term sum-frequency generation.

    Science.gov (United States)

    Möller, S; Andresen, A; Merschjann, C; Zimmermann, B; Prinz, M; Imlau, M

    2007-06-11

    Microscopic investigations of UV-induced formation of laser damage on LiB(3)O(5) optical surfaces during long-term sum-frequency generation (SFG) uncovers a significant growth of a SiO(2)-amorphous layer spatially limited to the illuminated area. The layer gives rise to a catastrophic break-down of the LiB(3)O(5)-output surface upon long-term laser operation even at intensities far below the laser-induced damage threshold. The interaction of UV laser light, LiB(3)O(5) surface and foreign atoms in the ambient atmosphere is discussed in the frame of a two-step process for surface-damage formation.

  12. Single-pass UV generation at 222.5 nm based on high-power GaN external cavity diode laser.

    Science.gov (United States)

    Ruhnke, N; Müller, A; Eppich, B; Güther, R; Maiwald, M; Sumpf, B; Erbert, G; Tränkle, G

    2015-05-01

    We demonstrate a compact system for single-pass frequency doubling of high-power GaN diode laser radiation. The deep UV laser light at 222.5 nm is generated in a β-BaB2O4 (BBO) crystal. A high-power GaN external cavity diode laser (ECDL) system in Littrow configuration with narrowband emission at 445 nm is used as pump source. At a pump power of 680 mW, a maximum UV power of 16 μW in continuous-wave operation at 222.5 nm is achieved. This concept enables a compact diode laser-based system emitting in the deep ultraviolet spectral range.

  13. UV Laser Development for Dual Species Co-Magnetometer using 129Xe and 199Hg

    Science.gov (United States)

    Altiere, Emily; Hayamizu, Tomohiro; Miller, Eric; Wienands, Joshua; Madison, Kirk; Momose, Takamasa; Jones, David

    2016-09-01

    The new ultracold neutron (UCN) facility under development at TRIUMF will introduce a dual co-magnetometer with cohabiting 129Xe and 199Hg for measuring the neutrons electric dipole moment (nEDM). By simultaneously incorporating two atomic species we can characterize both the magnitude and gradient of the magnetic field, thereby lowering the systematic uncertainties in the nEDM measurement. Toward this end, the spin precession of polarized 129Xe is detected by measuring the fluorescence decay following the spin-selective two-photon transition at 252-nm 5p6(1S0) -> 5p5(2P3 / 2) 6p. As there is no suitable commercial high power laser at 252 nm, we have built an optically pumped semiconductor laser with two stages of resonant frequency doubling to produce 320 mW at 252 nm. Further increase in the power, up to 7.5 W, is achieved via a 252 nm enhancement cavity. The precession of the second atomic source, 199Hg, is detected by absorption of 253-nm from the 6s2(1S0) -> 6s6p(3P1). We have constructed an analogous laser system as the 129Xe laser but at 253-nm. In this talk I will present the construction and characterization of these two laser systems.

  14. Application of UV laser fabrication to organ models interpolated from computed tomography and magnetic resonance images.

    Science.gov (United States)

    Nakai, T; Marutani, Y

    1992-09-01

    We have developed a unique laser fabrication system that uses an ultraviolet laser beam and liquid photopolymer. The system can easily be used to fabricate physical models without milling tools in only one process by using digital data obtained from medical computed tomography (CT) scanners or computer-aided design systems. We describe the fabrication of a smooth physical model such as a cerebrum, using the laser fabrication system, with the help of CT and magnetic resonance images that are made with coarse slices. Each sandwiched area between adjoining images is interpolated by using third-order spline curves in the cylindrical coordinate system. This modeling technique can play a major role in personal prosthesis, surgical planning, and implant design.

  15. EFFECT OF UV LASER ON SPECTRAL PROPERTIES OF BORATE GLASSES DOPED WITH COPPER CHLORIDE NANOCRYSTALS

    Directory of Open Access Journals (Sweden)

    A. N. Babkina

    2017-01-01

    Full Text Available We present the results of the pulsed ultraviolet laser effect on the spectral properties of the potassium-aluminium-borate glasses doped with the copper chloride nanocrystals with the average size of 3.1-6.3 nm. We have studied the changes of the exciton absorption spectra of the CuCl nanocrystals induced by different duration of the laser exposure. The results show the possibility of the laser-induced crystallization and growth of the nanocrystals. For the first time the effect of the irreversible photochromism has been obtained in the potassium-aluminium-borate glasses doped with the copper chloride nanocrystals. The effect is associated with the formation of the temperature stable Cu0n colloidal color centers.

  16. Réalisation de réseaux sur polymères par laser UV

    Science.gov (United States)

    Castex, M. C.; Fischer, A.; Simeonov, D.; Adès, D.; Siove, A.

    2003-06-01

    Nous présentons ici une méthode très simple de réalisation de réseaux d'amplitude de pas sub-micronique sur des films polymères à base de carbazote déposés sur des substrat de silice. Les réseaux sont fabriqués en irradiant avec un faisceau laser à 193nm un masque de phase placé au contact du film. La qualité des réseaux obtenus permet désormais d'envisager la réalisation de micro-cavités lasers de type planaire permettant de sélectionner une émission laser monomode autour de 400nm.

  17. Assessing EUV mask defectivity

    Science.gov (United States)

    Okoroanyanwu, Uzodinma; Tchikoulaeva, Anna; Ackmann, Paul; Wood, Obert; La Fontaine, Bruno; Bubke, Karsten; Holfeld, Christian; Peters, Jan Hendrik; Kini, Sumanth; Watson, Sterling; Lee, Isaac; Mu, Bo; Lim, Phillip; Raghunathan, Sudhar; Boye, Carol

    2010-04-01

    This paper assesses the readiness of EUV masks for pilot line production. The printability of well characterized reticle defects, with particular emphasis on those reticle defects that cause electrical errors on wafer test chips, is investigated. The reticles are equipped with test marks that are inspected in a die-to-die mode (using DUV inspection tool) and reviewed (using a SEM tool), and which also comprise electrically testable patterns. The reticles have three modules comprising features with 32 nm ground rules in 104 nm pitch, 22 nm ground rules with 80 nm pitch, and 16 nm ground rules with 56 nm pitch (on the wafer scale). In order to determine whether specific defects originate from the substrate, the multilayer film, the absorber stack, or from the patterning process, the reticles were inspected after each fabrication step. Following fabrication, the reticles were used to print wafers on a 0.25 NA full-field ASML EUV exposure tool. The printed wafers were inspected with state of the art bright-field and Deep UV inspection tools. It is observed that the printability of EUV mask defects down to a pitch of 56 nm shows a trend of increased printability as the pitch of the printed pattern gets smaller - a well established trend at larger pitches of 80 nm and 104 nm, respectively. The sensitivity of state-of-the-art reticle inspection tools is greatly improved over that of the previous generation of tools. There appears to be no apparent decline in the sensitivity of these state-of-the-art reticle inspection tools for higher density (smaller) patterns on the mask, even down to 56nm pitch (1x). Preliminary results indicate that a blank defect density of the order of 0.25 defects/cm2 can support very early learning on EUV pilot line production at the 16nm node.

  18. Polymer optical fiber Bragg grating inscription with a single UV laser pulse

    DEFF Research Database (Denmark)

    Pospori, Andreas; Marques, A.T.; Bang, Ole

    2017-01-01

    We experimentally demonstrate the first polymer optical fiber Bragg grating inscribed with only one krypton fluoride laser pulse. The device has been recorded in a single-mode poly(methyl methacrylate) optical fiber, with a core doped with benzyl dimethyl ketal for photosensitivity enhancement. One...... laser pulse with a duration of 15 ns, which provide energy density of 974 mJ/cm2, is adequate to introduce a refractive index change of 0.74×10-4 in the fiber core. After the exposure, the reflectivity of the grating increases for a few minutes following a second order exponential saturation...

  19. Laser spectroscopy and cooling of Yb+ ions on a deep-UV transition

    CERN Document Server

    Meyer, Hendrik M; Ratschbacher, Lothar; Zipkes, Christoph; Köhl, Michael

    2011-01-01

    We perform laser spectroscopy of Yb+ ions on the 4f14 6s 2S_{1/2} - 4f13 5d 6s 3D[3/2]_{1/2} transition at 297 nm. The frequency measurements for 170Yb+, 172Yb+, 174Yb+, and 176Yb+ reveal the specific mass shift as well as the field shifts. In addition, we demonstrate laser cooling of Yb+ ions using this transition and show that light at 297 nm can be used as the second step in the photoionization of neutral Yb atoms.

  20. Laser UV à semiconducteur nitrure pompé par des micropointes

    Science.gov (United States)

    Barjon, J.; Adelmann, C.; Baptist, R.; Brault, J.; Daudin, B.; Dang, Le Si; Molva, E.

    2002-06-01

    Dans un Laser à Semiconducteur Micropointes (LSM), le milieu amplificateur est pompé par un faisceau d'électrons issus de micropointes effet de champ. Ce type de laser est particulièrement adapté aux semi-conducteurs à grands gaps tels que les nitrures GaN et AIN émettant dans l'UltraViolet, pour lesquels le dopage et la prise de contact ohmique deviennent problématiques. Ce papier présente ce dispositif et l'état d'avancement des travaux.

  1. Kinetic analysis of the factors limiting the output power of the Ne-CuBr UV laser

    Institute of Scientific and Technical Information of China (English)

    Mao Bang-Ning; Pan Bai-Liang; Chen Li; Wang Ya-Juan; Yao Zhi-Xin

    2009-01-01

    The parametric optimization of the Ne-CuBr UV laser excited by longitudinal pulsed discharge is analysed by using a self-consistent kinetic model.Consistent characteristics of the optimization process are obtained by comparing with the experimental results.Simulation results show that neon ions come into being along with considerable depletion of the ground-state copper atoms.And the optimization of the discharge tube diameter is the tradeoff between the specific output photon density and the total active volume.Both the optimal neon gas pressure and the optimal reservoir temperature result from the balance between the neon ion density and the ground-state copper atom density to arrive at a maximum of their product.

  2. Development of a UV laser-induced fluorescence lidar for monitoring blue-green algae in Lake Suwa.

    Science.gov (United States)

    Saito, Yasunori; Takano, Kengo; Kobayashi, Fumitoshi; Kobayashi, Kazuki; Park, Ho-Dong

    2014-10-20

    We developed a UV (355 nm) laser-induced fluorescence (LIF) lidar for monitoring the real-time status of blue-green algae. Since the fluorescence spectrum of blue-green algae excited by 355 nm showed the specific fluorescence at 650 nm, the lidar was designed to be able to detect the 650 nm fluorescence as a surveillance method for the algae. The usefulness was confirmed by observation at Lake Suwa over four years (2005-2008). The detection limit of the LIF lidar was 16.65 mg/L for the blue-green algae, which is the range of concentrations in the safe level set by the World Health Organization.

  3. 紫外激光精细加工应用研究%Application of UV Laser Micro-Processing

    Institute of Scientific and Technical Information of China (English)

    骆公序; 陈俊; 王国庆; 潘涌; 姜兆华

    2011-01-01

    In this paper, nanosecond UV DPSS laser with multi-axis machine vision precision positioning machining system has beenused for cutting and drilling the materials of stainless steel, nickel plate, beryllium copper, and polyimide. By adjusting the defocusingdistance, scan speed, scan times, to achieve the 0.1mm thick metal sheet and polymer film processing, has gotten a smooth kerfprocessing effects with high precison and minimal heat-affected zones. Mechanism of different materials and process experimentalresults were analyzed, the results show that UV DPSS laser has the advantages in processing copper-like materials and polymer-likematerials%采用纳秒级紫外DPSS激光和具有机器视觉定位功能的多轴高精度加工系统,对不锈钢、镍片、铍铜、聚酰亚胺等多种材料进行切割和打孔试验.通过调节离焦量、扫描速度、扫描次数,实现了0.1 mm的金属薄板和聚合物薄膜的加工,取得了切缝光滑的加工效果,并且具有加工精度高、热效应小等特点.对不同材料的作用机理和工艺实验结果进行了分析,结果表明,紫外DPSS激光在铜类材料和聚合物类材料的加工上具有优势.

  4. Study of Polymer Material Aging by Laser Mass Spectrometry, UV-Visible Spectroscopy, and Environmental Scanning Electron Microscopy

    Directory of Open Access Journals (Sweden)

    Junien Exposito

    2007-01-01

    Full Text Available Dyed natural rubber (NR and styrene butadiene rubber (SBR, designed for outdoor applications, were exposed to an accelerated artificial aging in xenon light. The aging results in the deterioration of the exposed surface material properties. The ability of dyed polymers to withstand prolonged sunlight exposure without fading or undergoing any physical deterioration is largely determined not only by the photochemical characteristics of the absorbing dyestuff itself but also by the polymer structure and fillers. Results obtained by laser mass spectrometry, UV-visible spectroscopy, and environmental scanning electron microscopy indicate that dyed filled NR and SBR samples behave differently during the photo-oxidation. The fading of the dyed polymers was found to be promoted in the NR sample. This can be correlated with LDI-FTICRMS results, which show the absence of [M-H]− orange pigment pseudomolecular ion and also its fragment ions after aging. This is confirmed by both EDX and UV/Vis spectroscopy. EDX analysis indicates a concentration of chlorine atoms, which can be considered as a marker of orange pigment or its degradation products, only at the surface of SBR flooring after aging. Reactivity of radicals formed during flooring aging has been studied and seems to greatly affect the behavior of such organic pigments.

  5. Laser ablation of lysozyme with UV, visible and infrared femto- and nanosecond pulses

    DEFF Research Database (Denmark)

    Schou, Jørgen; Canulescu, Stela; Matei, Andreea

    industry. Lysozyme molecules do not absorb energy for wavelengths above 310 nm, but nevertheless there is a strong mass loss by ablation for laser irradiation in the visible regime. The total ablation yield of lysozyme at 355 nm and at 2 J/cm2 is about 155 µg/pulse, possibly one of the highest ablation...

  6. UV Direct Laser Interference Patterning of polyurethane substrates as tool for tuning its surface wettability

    Energy Technology Data Exchange (ETDEWEB)

    Estevam-Alves, Regina [Instituto de Física de São Carlos, Universidade de São Paulo, 13560-970 São Carlos (Brazil); Günther, Denise; Dani, Sophie; Eckhardt, Sebastian; Roch, Teja [Fraunhofer Institute for Material and Beam Technology IWS, Winterbergstr. 28, Dresden 01277 (Germany); Chair for Large Area Laser Based Surface Micro/Nano-Structuring, Institute for Manufacturing Technology, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden (Germany); Mendonca, Cleber R., E-mail: crmendon@ifsc.usp.br [Instituto de Física de São Carlos, Universidade de São Paulo, 13560-970 São Carlos (Brazil); Cestari, Ismar N. [Heart Institute (InCOr), University of São Paulo Medical School, São Paulo 05403-000 (Brazil); Lasagni, Andrés F., E-mail: andres_fabian.lasagni@tu-dresden.de [Fraunhofer Institute for Material and Beam Technology IWS, Winterbergstr. 28, Dresden 01277 (Germany); Chair for Large Area Laser Based Surface Micro/Nano-Structuring, Institute for Manufacturing Technology, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden (Germany)

    2016-06-30

    Highlights: • First reported experiments on Direct Laser Interference Patterning of polyurethane. • First reported sub-micrometer structures (feature size ∼250 nm) fabricated in polyurethane materials using laser processing technologies. • Anisotropic wetting behavior of structured surfaces and possibility to tune the contact angle as function of surface structure parameters. - Abstract: Direct Laser Interference Patterning (DLIP) is a versatile tool for the fabrication of micro and sub-micropatterns on different materials. In this work, DLIP was used to produce periodic surface structures on polyurethane (PU) substrates with spatial periods ranging from 0.5 to 5.0 μm. The influence of the laser energy density on the quality and topographical characteristics of the produced micropatterns was investigated. To characterize the surface topography of the produced structures, Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and Confocal Microscopy (CFM) were utilized. It was found that high quality and defect free periodic line-like patterns with spatial periods down to 500 nm could be fabricated, with structure depths between 0.88 up to 1.25 μm for spatial periods larger than 2.0 μm and up to 270 nm for spatial periods between 500 nm and 1.0 μm. Measurements of the contact angle of water on the treated surface allowed to identify an anisotropic wetting behavior depending mainly on the spatial period and filling factor of the structured surfaces.

  7. Broadening and attenuation of UV laser ablation plumes in background gases

    DEFF Research Database (Denmark)

    Amoruso, S.; Toftmann, B.; Schou, Jørgen

    2005-01-01

    The expansion of a laser-induced silver plume in a background gas has been studied in a variety of gases ranging from helium, oxygen and argon to xenon. We have measured the angular distribution of the total deposit of silver on an array of quartz crystal microbalances as well as the time-of-flig...

  8. Applicability of UV laser-induced solid-state fluorescence spectroscopy for characterization of solid dosage forms.

    Science.gov (United States)

    Woltmann, Eva; Meyer, Hans; Weigel, Diana; Pritzke, Heinz; Posch, Tjorben N; Kler, Pablo A; Schürmann, Klaus; Roscher, Jörg; Huhn, Carolin

    2014-10-01

    High production output of solid pharmaceutical formulations requires fast methods to ensure their quality. Likewise, fast analytical procedures are required in forensic sciences, for example at customs, to substantiate an initial suspicion. We here present the design and the optimization of an instrumental setup for rapid and non-invasive characterization of tablets by laser-induced fluorescence spectroscopy (with a UV-laser (λ ex = 266 nm) as excitation source) in reflection geometry. The setup was first validated with regard to repeatability, bleaching phenomena, and sensitivity. The effect on the spectra by the physical and chemical properties of the samples, e.g. their hardness, homogeneity, chemical composition, and granule grain size of the uncompressed material, using a series of tablets, manufactured in accordance with design of experiments, was investigated. Investigation of tablets with regard to homogeneity, especially, is extremely important in pharmaceutical production processes. We demonstrate that multiplicative scatter correction is an appropriate tool for data preprocessing of fluorescence spectra. Tablets with different physical and chemical characteristics can be discriminated well from their fluorescence spectra by subjecting the results to principal component analysis.

  9. Matrix-Free UV-Laser Desorption Ionization Mass Spectrometry as a Versatile Approach for Accelerating Dereplication Studies on Lichens.

    Science.gov (United States)

    Le Pogam, Pierre; Schinkovitz, Andreas; Legouin, Béatrice; Le Lamer, Anne-Cécile; Boustie, Joël; Richomme, Pascal

    2015-10-20

    The present study examined the suitability of laser desorption/ionization time-of-flight mass spectrometry (LDI-MS) for the rapid chemical fingerprinting of lichen extracts. Lichens are known to produce a wide array of secondary metabolites. Most of these compounds are unique to the symbiotic condition but some can be found in many species. Therefore, dereplication, that is, the rapid identification of known compounds within a complex mixture is crucial in the search for novel natural products. Over the past decade, significant advances were made in analytical techniques and profiling methods specifically adapted to crude lichen extracts, but LDI-MS has never been applied in this context. However, most classes of lichen metabolites have UV chromophores, which are quite similar to commercial matrix molecules used in matrix-assisted laser desorption ionization (MALDI). It is consequently postulated that these molecules could be directly detectable by matrix-free LDI-MS. The present study evaluated the versatility of this technique by investigating the LDI properties of a vast array of single lichen metabolites as well as lichen extracts of known chemical composition. Results from the LDI experiments were compared with those obtained by direct ESI-MS detection as well as LC-ESI-MS. It was shown that LDI ionization leads to strong molecular ion formation with little fragmentation, thus, facilitating straightforward spectra interpretation and representing a valuable alternative to time-consuming LC-MS analysis.

  10. Optimization of graffiti removal on natural stone by means of high repetition rate UV laser

    Science.gov (United States)

    Fiorucci, M. P.; López, A. J.; Ramil, A.; Pozo, S.; Rivas, T.

    2013-08-01

    The use of laser for graffiti removal is a promising alternative to conventional cleaning methods, though irradiation parameters must be carefully selected in order to achieve the effective cleaning without damaging the substrate, especially when referring to natural stone. From a practical point of view, once a safe working window is selected, it is necessary to determine the irradiation conditions to remove large paint areas, with minimal time consumption. The aim of this paper is to present a systematic procedure to select the optimum parameters for graffiti removal by means of the 3rd harmonic of a high repetition rate nanosecond Nd:YVO4 laser. Ablation thresholds of four spray paint colors were determined and the effect of pulse repetition frequency, beam diameter and line scan separation was analyzed, obtaining a set of values which optimize the ablation process.

  11. Optimization of graffiti removal on natural stone by means of high repetition rate UV laser

    Energy Technology Data Exchange (ETDEWEB)

    Fiorucci, M.P., E-mail: m.p.fiorucci@udc.es [Centro de Investigacións Tecnolóxicas, Universidade da Coruña, 15403 Ferrol (Spain); Dpto. Enxeñaría dos Recursos Naturais e Medio Ambiente, E.T.S.E. Minas, Universidade de Vigo, 36200 Vigo (Spain); López, A.J., E-mail: ana.xesus.lopez@udc.es [Centro de Investigacións Tecnolóxicas, Universidade da Coruña, 15403 Ferrol (Spain); Ramil, A., E-mail: alberto.ramil@udc.es [Centro de Investigacións Tecnolóxicas, Universidade da Coruña, 15403 Ferrol (Spain); Pozo, S., E-mail: ipozo@uvigo.es [Dpto. Enxeñaría dos Recursos Naturais e Medio Ambiente, E.T.S.E. Minas, Universidade de Vigo, 36200 Vigo (Spain); Rivas, T., E-mail: trivas@uvigo.es [Dpto. Enxeñaría dos Recursos Naturais e Medio Ambiente, E.T.S.E. Minas, Universidade de Vigo, 36200 Vigo (Spain)

    2013-08-01

    The use of laser for graffiti removal is a promising alternative to conventional cleaning methods, though irradiation parameters must be carefully selected in order to achieve the effective cleaning without damaging the substrate, especially when referring to natural stone. From a practical point of view, once a safe working window is selected, it is necessary to determine the irradiation conditions to remove large paint areas, with minimal time consumption. The aim of this paper is to present a systematic procedure to select the optimum parameters for graffiti removal by means of the 3rd harmonic of a high repetition rate nanosecond Nd:YVO{sub 4} laser. Ablation thresholds of four spray paint colors were determined and the effect of pulse repetition frequency, beam diameter and line scan separation was analyzed, obtaining a set of values which optimize the ablation process.

  12. Deposition of Y thin films by nanosecond UV pulsed laser ablation for photocathode application

    Energy Technology Data Exchange (ETDEWEB)

    Lorusso, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Anni, M. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Caricato, A.P. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Gontad, F., E-mail: francisco.gontad@le.infn.it [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Perulli, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Taurino, A. [National Research Council, Institute for Microelectronics & Microsystems, 73100 Lecce (Italy); Perrone, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Chiadroni, E. [Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare, 00044 Frascati (Italy)

    2016-03-31

    In this work, yttrium (Y) thin films have been deposited on Si (100) substrates by the pulsed laser deposition technique. Ex-situ morphological, structural and optical characterisations of such films have been performed by scanning electron microscopy, X-ray diffractometry, atomic force microscopy and ellipsometry. Polycrystalline films with a thickness of 1.2 μm, homogenous with a root mean square roughness of about 2 nm, were obtained by optimised laser irradiation conditions. Despite the relatively high thickness, the films resulted very adherent to the substrates. The high quality of such thin films is important to the synthesis of metallic photocathodes based on Y thin film, which could be used as electron sources of high photoemission performance in radio-frequency guns. - Highlights: • Pulsed laser deposition of Yttrium thin films is investigated. • 1.2 μm thick films were deposited with very low RMS roughness. • The Y thin films were very adherent to the Si substrate • Optical characterisation showed a very high absorption coefficient for the films.

  13. Generation of UV radiation at 335.5 nm based on frequency-quadrupling of a diode-pumped Nd:YVO4 laser

    Institute of Scientific and Technical Information of China (English)

    Xiuwei Fan; Haitao Huang; Jijian Jiang; Jingliang He

    2008-01-01

    The generation of ultraviolet(UV)light at 335.5 nm based on frequency quadrupling of a diode-endpumped Q-switched Nd:YVO4 laser at 1342 nm was demonstrated.KTP crystal was used for generation of wavelength of 671 nm by intracavity doubling and LBO (BBO) crystal Was exploited for the subsequent external fourth harmonic generation(FHG).With 6.3-W absorbed pump power and 10-kHz frequency repetition rate,the UV output power of 35 and 63 mW were obtained by using LBO and BBO as frequency quadrupling nonlinear crystals, respectively. The experimenta results show that the conversion efficiency (red-UV)of 6.4% for BBO crystal is higher than that of 3.5% for LB0 crystal, but the UV beam quality obtained by LBO crystal is better than by BBO crystal.

  14. Predictive modeling, simulation, and optimization of laser processing techniques: UV nanosecond-pulsed laser micromachining of polymers and selective laser melting of powder metals

    Science.gov (United States)

    Criales Escobar, Luis Ernesto

    One of the most frequently evolving areas of research is the utilization of lasers for micro-manufacturing and additive manufacturing purposes. The use of laser beam as a tool for manufacturing arises from the need for flexible and rapid manufacturing at a low-to-mid cost. Laser micro-machining provides an advantage over mechanical micro-machining due to the faster production times of large batch sizes and the high costs associated with specific tools. Laser based additive manufacturing enables processing of powder metals for direct and rapid fabrication of products. Therefore, laser processing can be viewed as a fast, flexible, and cost-effective approach compared to traditional manufacturing processes. Two types of laser processing techniques are studied: laser ablation of polymers for micro-channel fabrication and selective laser melting of metal powders. Initially, a feasibility study for laser-based micro-channel fabrication of poly(dimethylsiloxane) (PDMS) via experimentation is presented. In particular, the effectiveness of utilizing a nanosecond-pulsed laser as the energy source for laser ablation is studied. The results are analyzed statistically and a relationship between process parameters and micro-channel dimensions is established. Additionally, a process model is introduced for predicting channel depth. Model outputs are compared and analyzed to experimental results. The second part of this research focuses on a physics-based FEM approach for predicting the temperature profile and melt pool geometry in selective laser melting (SLM) of metal powders. Temperature profiles are calculated for a moving laser heat source to understand the temperature rise due to heating during SLM. Based on the predicted temperature distributions, melt pool geometry, i.e. the locations at which melting of the powder material occurs, is determined. Simulation results are compared against data obtained from experimental Inconel 625 test coupons fabricated at the National

  15. Active and passive stabilization of a high-power UV frequency-doubled diode laser

    CERN Document Server

    Eismann, Ulrich; Simeonidis, Konstantinos; Keller, Felix; Rohde, Felix; Opalevs, Dmitrijs; Scholz, Matthias; Kaenders, Wilhelm; Stuhler, Jürgen

    2016-01-01

    We present a resonantly frequency-doubled tapered amplified semiconductor laser system emitting up to 2.6 W blue light at 400 nm. The output power is stable on both short and long timescales with 0.12% RMS relative intensity noise, and less than 0.15%/h relative power loss over 16 hours of free running continuous operation. Furthermore, the output power can be actively stabilized, and the alignment of the input beams of the tapered amplifier chip, the frequency doubling cavity and-in case of fiber output-the fiber can be optimized automatically using computer-controlled mirrors.

  16. Analysis of tungsten carbide coatings by UV laser ablation inductively coupled plasma atomic emission spectrometry

    Science.gov (United States)

    Kanicky, V.; Otruba, V.; Mermet, J.-M.

    2000-06-01

    Tungsten carbide coatings (thickness 0.1-0.2 mm) containing 8.0, 12.2, 17.2 and 22.9% Co were studied with laser ablation inductively coupled plasma atomic emission spectrometry (LA-ICP-AES). Composition of these plasma sprayed deposits on steel disks was determined using X-ray fluorescence spectrometry and electron microprobe energy/wavelength dispersive X-ray spectrometry. The coatings were ablated by means of a Q-switched Nd:YAG laser at 266 nm (10 Hz, 10 mJ per shot) coupled to an ICP echelle-based spectrometer equipped with a segmented charge-coupled device detector. Non-linear dependences of cobalt lines intensities on the Co percentage were observed both at a single spot ablation and at a sample translation. This behaviour could be attributed to a complex phase composition of the system W-C-Co. However, employing tungsten as internal standard the linear calibration was obtained for studied analytical lines Co II 228.616 nm, Co II 230.786 nm, Co II 236.379 nm and Co II 238.892 nm.

  17. Test measurements on a secco white-lead containing model samples to assess the effects of exposure to low-fluence UV laser radiation

    Energy Technology Data Exchange (ETDEWEB)

    Raimondi, Valentina, E-mail: v.raimondi@ifac.cnr.it [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Andreotti, Alessia; Colombini, Maria Perla [Chemistry and Industrial Chemistry Department (DCCI) - University of Pisa, Pisa (Italy); Cucci, Costanza [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Cuzman, Oana [Institute for the Conservation and Promotion of Cultural Heritage - National Research Council (CNR-ICVBC), Firenze (Italy); Galeotti, Monica [Opificio delle Pietre Dure (OPD), Firenze (Italy); Lognoli, David; Palombi, Lorenzo; Picollo, Marcello [‘Nello Carrara’ Applied Physics Institute - National Research Council of Italy (CNR-IFAC), Firenze (Italy); Tiano, Piero [Institute for the Conservation and Promotion of Cultural Heritage - National Research Council (CNR-ICVBC), Firenze (Italy)

    2015-05-15

    Highlights: • A set of a secco model samples was prepared using white lead and four different organic binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). • The samples were irradiated with low-fluence UV laser pulses (0.1–1 mJ/cm{sup 2}). • The effects of laser irradiation were analysed by using different techniques. • The analysis did not point out changes due to low-fluence laser irradiation. • High fluence (88 mJ/cm{sup 2}) laser radiation instead yielded a chromatic change ascribed to the inorganic component. - Abstract: Laser-induced fluorescence technique is widely used for diagnostic purposes in several applications and its use could be of advantage for non-invasive on-site characterisation of pigments or other compounds in wall paintings. However, it is well known that long-time exposure to UV and VIS radiation can cause damage to wall paintings. Several studies have investigated the effects of lighting, e.g., in museums: however, the effects of low-fluence laser radiation have not been studied much so far. This paper investigates the effects of UV laser radiation using fluences in the range of 0.1 mJ/cm{sup 2}–1 mJ/cm{sup 2} on a set of a secco model samples prepared with lead white and different type of binders (animal glue and whole egg, whole egg, skimmed milk, egg-oil tempera). The samples were irradiated using a Nd:YAG laser (emission wavelength at 355 nm; pulse width: 5 ns) by applying laser fluences between 0.1 mJ/cm{sup 2} and 1 mJ/cm{sup 2} and a number of laser pulses between 1 and 500. The samples were characterised before and after laser irradiation by using several techniques (colorimetry, optical microscopy, fibre optical reflectance spectroscopy, FT-IR spectroscopy Attenuated Total Reflectance microscopy and gas chromatography/mass spectrometry), to detect variations in the morphological and physico-chemical properties. The results did not point out significant changes in the sample properties after

  18. Electronic sideband locking of 318.6nm UV laser to an ultrastable optical cavity with a wide continuously tunable range

    CERN Document Server

    Bai, Jiandong; He, Jun; Wang, Junmin

    2016-01-01

    We have demonstrated a frequency-stabilized tunable 318.6 nm ultraviolet (UV) laser system for the single-photon 6S1/2 - nP (n = 70 ~ 100) Rydberg excitation of cesium atoms. The 637.2 nm laser produced by single-pass sum frequency generation from two infrared fiber lasers is offset locked to a high-finesse ultra-low expansion (ULE) optical cavity placed in ultra-high vacuum using the electronic sideband locking technique. The generated 318.6 nm UV laser via cavity-enhanced second-harmonic generation can be continuously tuned over 4 GHz by indirectly changing modulation frequency on the electro-optic phase modulator while the whole laser system remains locked. We analyze the tuning range mainly depends on the modulator bandwidth and the tunable range of the seed laser. The locking scheme offers a method to compensate the frequency difference between the reference frequency and the goal frequency to a desired excited state, and has huge potential in precision spectroscopic experiments of cold atoms.

  19. Ruthenium Grubbs' catalyst nanostructures grown by UV-excimer-laser ablation for self-healing applications

    Energy Technology Data Exchange (ETDEWEB)

    Aiessa, B., E-mail: brahim.aissa@mpbc.ca [Department of Smart Materials and Sensors for Space Missions, MPB Technologies Inc., 151 Hymus Blvd., Montreal H9R 1E9 (Canada); Nechache, R. [Centre Energie, Materiaux et Telecommunications. Institut National de la Recherche Scientifique, INRS-EMT, 1650, Blvd. Lionel-Boulet, Varennes, Quebec J3X 1S2 (Canada); Haddad, E.; Jamroz, W. [Department of Smart Materials and Sensors for Space Missions, MPB Technologies Inc., 151 Hymus Blvd., Montreal H9R 1E9 (Canada); Merle, P.G. [Concordia Center for Composites, Department of Mechanical and Industrial Engineering, Concordia University, Montreal, Quebec H3G 2M8 (Canada); Rosei, F., E-mail: rosei@emt.inrs.ca [Centre Energie, Materiaux et Telecommunications. Institut National de la Recherche Scientifique, INRS-EMT, 1650, Blvd. Lionel-Boulet, Varennes, Quebec J3X 1S2 (Canada)

    2012-10-01

    Highlights: Black-Right-Pointing-Pointer Successful preparation of 5-Ethylidene-2-Norbornene (5E2N) monomer reacted with Ruthenium Grubbs' Catalyst (RGC) composite. Black-Right-Pointing-Pointer The kinetics of the 5E2N ring opening metathesis polymerization (ROMP) is effective in a large temperature range (-20 to 45 Degree-Sign C). Black-Right-Pointing-Pointer The kinetics of the 5E2N ROMP is occurring at very short time scales (<1 min at 40 Degree-Sign C). Black-Right-Pointing-Pointer Successful preparation of RGC nanoparticles (NPs) by UV-excimer laser ablation approach. Black-Right-Pointing-Pointer The ROMP reaction associated to RGC-NPs was achieved at an unprecedented extreme low RGC, equivalent to 0.00117 Vol.%. - Abstract: A self healing composite material consisting of 5-Ethylidene-2-Norbornene (5E2N) monomer reacted with Ruthenium Grubbs' Catalyst (RGC) was prepared. First, the kinetics of the 5E2N ring opening metathesis polymerization (ROMP) reaction RGC was studied as a function of temperature. We show that the polymerization reaction is still effective in a large temperature range (-15 to 45 Degree-Sign C), occurring at short time scales (less than 1 min at 40 Degree-Sign C). Second, the amount of RGC required for ROMP reaction significantly decreased through its nanostructuration by means of a UV-excimer laser ablation process. RGC nanostructures of few nanometers in size where successfully obtained directly on silicon substrates. The X-ray photoelectron spectroscopy data strongly suggest that the RGC still keep its original stoichiometry after nanostructuration. More importantly, the associated ROMP reaction was successfully achieved at an extreme low RGC concentration equivalent to (11.16 {+-} 1.28) Multiplication-Sign 10{sup -4} Vol.%, occurring at very short time reaction. This approach opens new prospects for using healing agent nanocomposite materials for self-repair functionality, thereby obtaining a higher catalytic efficiency per

  20. Mask and wafer evaluation of Sigma7500 pattern generator applied to 65nm logic metal and via layers

    Science.gov (United States)

    Liu, Frank; Shi, Irene; Liu, Qingwei; Zhu, Likeit; Zhao, Shirley; Guo, Eric

    2009-04-01

    As pattern density and OPC complexity grow, photomask write times on electron beam tools increase in proportion. Reducing the write time would decrease mask-making costs, but the performance of any alternative mask writer must meet all of the technical requirements on both mask and wafer. In addition, it is desirable to use existing OPC models in order to avoid the costs of developing and maintaining separate OPC models for each writer. The Sigma7500 deep-UV pattern generator provides the highest resolution available from a laser-based tool, and it has the advantage of maintaining about a 3 hour write time even as the feature count increases. In this study, the Sigma7500 and a variable shaped e-beam (VSB) tool are compared on 65nm metal1 and via1 layers. In the first phase, the Sigma pattern positioning was matched to a SMIC reference grid and a registration value of 10 nm (3s) was achieved with scales removed. In the second phase, M1 and V1 masks were printed with both laser and e-beam writers using the same pattern data and compared on CD uniformity, linearity and proximity. The Sigma7500 met all of the photomask requirements for these layers. The masks were then printed on wafers and the wafer data was evaluated. The results were comparable to those for the e-beam masks and were within the requirements, indicating that the Sigma7500 can handle these layers without the need to revise the e-beam mask OPC models.

  1. A conformational study of protonated noradrenaline by UV-UV and IR dip double resonance laser spectroscopy combined with an electrospray and a cold ion trap method.

    Science.gov (United States)

    Wako, Hiromichi; Ishiuchi, Shun-Ichi; Kato, Daichi; Féraud, Géraldine; Dedonder-Lardeux, Claude; Jouvet, Christophe; Fujii, Masaaki

    2017-05-03

    The conformer-selected ultraviolet (UV) and infrared (IR) spectra of protonated noradrenaline were measured using an electrospray/cryogenic ion trap technique combined with photo-dissociation spectroscopy. By comparing the UV photo dissociation (UVPD) spectra with the UV-UV hole burning (HB) spectra, it was found that five conformers coexist under ultra-cold conditions. Based on the spectral features of the IR dip spectra of each conformer, two different conformations on the amine side chain were identified. Three conformers (group I) were assigned to folded and others (group II) to extended structures by comparing the observed IR spectra with the calculated ones. Observation of the significantly less-stable extended conformers strongly suggests that the extended structures are dominant in solution and are detected in the gas phase by kinetic trapping. The conformers in each group are assignable to rotamers of OH orientations in the catechol ring. By comparing the UV-UV HB spectra and the calculated Franck-Condon spectra obtained by harmonic vibrational analysis of the S1 state, with the aid of relative stabilization energies of each conformer in the S0 state, the absolute orientations of catechol OHs of the observed five conformers were successfully determined. It was found that the 0-0 transition of one folded conformer is red-shifted by about 1000 cm(-1) from the others. The significant red-shift was explained by a large contribution of the πσ* state to S1 in the conformer in which an oxygen atom of the meta-OH group is close to the ammonium group.

  2. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  3. Ultra-shallow box-like profiles fabricated by pulsed UV-laser doping process

    Energy Technology Data Exchange (ETDEWEB)

    Ishida, E.; Sigmon, T.W. [Stanford Univ., CA (United States); Weiner, K.H. [Lawrence Livermore National Lab., CA (United States)

    1993-03-23

    Ultra-shallow, box-like impurity profiles are produced using Gas Immersion Laser Doping (GILD) and then analyzed by spreading resistance profilometry (SRP) and secondary ion mass spectrometry (SIMS) to determine the impurity distribution. At high concentrations, the profiles obtained by SRP exhibit the expected box-like shape over the entire range of junction depths: The measured concentration within the junction region is uniform while the dopant gradient at the junction exceeds 0.5 decades/nm. In comparison, the same profiles analyzed by SIMS show a broader transition at the metallurgical junction. Caused by knock-ons and ion mixing during the sputtering process, this inaccuracy is reduced, but not eliminated by lowering the acceleration energy of the primary Cs{sup +} ion beam. At lower concentrations (< 10{sup 19}/cm{sup 3}), profiles analyzed by SRP exhibit shallower junctions than expected. Electrical measurements of diodes and Hall structures show that high-quality, ultra-shallow n{sup +}p, np and pn are fabricated with good dose control using GILD. For complete characterization of GILD, accurate measurement of both chemical and electrically-active dopant profiles are required. At present, neither SIMS nor SRP provides an entirely accurate impurity profile.

  4. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  5. 几丁多糖面膜在激光术后创面护理的临床评价%Clinical analysis with SACCHACHITIN facial masks for postoperative laser care

    Institute of Scientific and Technical Information of China (English)

    栾琪; 孙静; 李强; 刘玲; 王竞; 刘斌; 高天文

    2011-01-01

    Objective To evaluate the clinical effect and safety using SACCHACHITIN facial masks for treating postoperative laser care. Methods By means of a study of half-face control.a total of fifteen subjects received by Er: YAG fractional laser once were treated by SACCHACHITIN facial masks at 0 days,1 days,3 days and 7 days after laser operation, respectively. After treatment, they were followed up to assess the clinical effect and adverse reaction. Results After the treatment of SACCHACHITIN facial masks.the reduction of subjective symptoms and acceleration of wound healing were statistically significant.And no adverse reactions occurred in all subjects. Conclusion The use of SACCHACHITIN facial masks is a safe.effective and very valuable strategy for postoperative laser care.%目的:评价几丁多糖面膜在点阵激光术后创面护理中的临床疗效和安全性.方法:纳入面部行Er:YAG点阵激光治疗后的受试者15例,采用单侧脸自身对照策略,治疗后即刻给予冰几丁多糖面膜冷敷,观察该面膜对激光术后皮肤炎症反应抑制和主观症状缓解的临床疗效,同时检测其不良反应.结果:所有激光术后受试者经过几丁多糖面膜治疗后,无论主观症状的缓解,还是皮损恢复病程的缩短,均明显优于对照侧,整个治疗过程并无严重不良反应发生.结论:几丁多糖面膜用于激光术后护理是一种具有确切疗效、安全的治疗策略.

  6. Single photon infrared emission spectroscopy: a study of IR emission from UV laser excited PAHs between 3 and 15 micrometers

    Science.gov (United States)

    Cook, D. J.; Schlemmer, S.; Balucani, N.; Wagner, D. R.; Harrison, J. A.; Steiner, B.; Saykally, R. J.

    1998-01-01

    Single-photon infrared emission spectroscopy (SPIRES) has been used to measure emission spectra from polycyclic aromatic hydrocarbons (PAHs). A supersonic free-jet expansion has been used to provide emission spectra of rotationally cold and vibrationally excited naphthalene and benzene. Under these conditions, the observed width of the 3.3-micrometers (C-H stretch) band resembles the bandwidths observed in experiments in which emission is observed from naphthalene with higher rotational energy. To obtain complete coverage of IR wavelengths relevant to the unidentified infrared bands (UIRs), UV laser-induced desorption was used to generate gas-phase highly excited PAHs. Lorentzian band shapes were convoluted with the monochromator-slit function in order to determine the widths of PAH emission bands under astrophysically relevant conditions. Bandwidths were also extracted from bands consisting of multiple normal modes blended together. These parameters are grouped according to the functional groups mostly involved in the vibration, and mean bandwidths are obtained. These bandwidths are larger than the widths of the corresponding UIR bands. However, when the comparison is limited to the largest PAHs studied, the bandwidths are slightly smaller than the corresponding UIR bands. These parameters can be used to model emission spectra from PAH cations and cations of larger PAHs, which are better candidate carriers of the UIRs.

  7. Analysis of chromosome positions in the interphase nucleus of Chinese hamster cells by laser-UV-microirradiation experiments

    Energy Technology Data Exchange (ETDEWEB)

    Cremer, T.; Baumann, H.; Cremer, C.; Schneider, T.; Hens, L.; Kirsch-Volders, M.

    1982-01-01

    Unsynchronized cells of an essentially diploid strain of female Chinese hamster cells derived from lung tissue (CHL) were laser-UV-microirradiated (lambda=257 nm) in the nucleus either at its central part or at its periphery. After 7-9 h postincubation with 0.5 mM caffeine, chromosome preparations were made in situ. Twenty-one and 29 metaphase spreads, respectively, with partial chromosome shattering (PCS) obtained after microirradiation at these two nuclear sites, were Q-banded and analyzed in detail. A positive correlation was observed between the frequency of damage of chromosomes and both their DNA content and length at metaphase. No significant difference was observed between the frequencies of damage obtained for individual chromosomes at either site of microirradiation. The frequency of joint damage of homologous chromosomes was low as compared to nonhomologous ones. Considerable variation was noted in different cells in the combination of jointly shattered chromosomes. Evidence which justifies an interpretation of these data in terms of an interphase arrangement of chromosome territories is discussed. Our data strongly argue against somatic pairing as a regular event, and suggest a considerable variability of chromosome positions in different nuclei. However, present data do not exclude the possibility of certain non-random chromosomal arrangements in CHL-nuclei. The interphase chromosome distribution revealed by these experiments is compared with centromere-centromere, centromere-center and angle analyses of metaphase spreads and the relationship between interphase and metaphase arrangements of chromosomes is discussed.

  8. Inscription laser UV pulsé sur nouveau matériau hybride pour codeurs optiques intégrés

    OpenAIRE

    Gatti, Sylvain

    2007-01-01

    Integrated Optics is a promising technique for mass production of optical circuits for telecommunications and sensor applications.Sol-Gel Technology has been proved to be efficient. A new hybrid material of epoxy type has been developed in order to simplify synthesis and improve performance such as adhesion.This work is aimed to develop a new UV Laser setup in an epoxy layer and the definition of the associated protocol. This local polymerization process is a promising alternative to the conv...

  9. UV-laser-based microscopic dissection of tree rings - a novel sampling tool for δ(13) C and δ(18) O studies.

    Science.gov (United States)

    Schollaen, Karina; Heinrich, Ingo; Helle, Gerhard

    2014-02-01

    UV-laser-based microscopic systems were utilized to dissect and sample organic tissue for stable isotope measurements from thin wood cross-sections. We tested UV-laser-based microscopic tissue dissection in practice for high-resolution isotopic analyses (δ(13) C/δ(18) O) on thin cross-sections from different tree species. The method allows serial isolation of tissue of any shape and from millimetre down to micrometre scales. On-screen pre-defined areas of interest were automatically dissected and collected for mass spectrometric analysis. Three examples of high-resolution isotopic analyses revealed that: in comparison to δ(13) C of xylem cells, woody ray parenchyma of deciduous trees have the same year-to-year variability, but reveal offsets that are opposite in sign depending on whether wholewood or cellulose is considered; high-resolution tree-ring δ(18) O profiles of Indonesian teak reflect monsoonal rainfall patterns and are sensitive to rainfall extremes caused by ENSO; and seasonal moisture signals in intra-tree-ring δ(18) O of white pine are weighted by nonlinear intra-annual growth dynamics. The applications demonstrate that the use of UV-laser-based microscopic dissection allows for sampling plant tissue at ultrahigh resolution and unprecedented precision. This new technique facilitates sampling for stable isotope analysis of anatomical plant traits like combined tree eco-physiological, wood anatomical and dendroclimatological studies.

  10. Testing relativity again, laser, laser, laser, laser

    NARCIS (Netherlands)

    Einstein, A.

    2015-01-01

    laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser, laser,

  11. Investigation of the Periodic Microstructure Induced by a 355 nm UV Polarized Laser on a Polyimide Surface

    Institute of Scientific and Technical Information of China (English)

    李梅; 路庆华; 印杰; 罗售余; 王宗光

    2002-01-01

    We investigate a periodic microstructure induced by a 355 nm ultraviolet polarized laser on a polyimide surface and the dependence of the structures on laser parameters. Laser-induced periodic surface structures (LIPSS) of sub-micrometre size were generated on three kinds of polyimide films by a polarized Nd:YAG laser of 355nm within a wide range of laser fluence. The chemical structure of the polyimide, the film-making process, the number of laser pulses and the laser fluence greatly influenced the formation of LIPSS. The periodicity of LIPSS was decided by the wavelength, the incidence angle of the laser beam and the apparent refractive index of the material.

  12. Mask industry assessment: 2004

    Science.gov (United States)

    Shelden, Gilbert V.; Hector, Scott D.

    2004-12-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the third in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey builds upon the 2003 survey to provide an ongoing database using the same questions as a baseline with only a few minor changes or additions. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from ten major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

  13. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  14. Analyzing EUV mask costs

    Science.gov (United States)

    Lercel, Michael; Kasprowicz, Bryan

    2016-10-01

    The introduction of Extreme Ultraviolet Lithography (EUV) as a replacement for multiple patterning is based on improvements of cycle time, yield, and cost. Earlier cost studies have assumed a simple assumption that EUV masks (being more complex with the multilayer coated blank) are not more than three times as expensive as advanced ArFi (ArF immersion) masks. EUV masks are expected to be more expensive during the ramp of the technology because of the added cost of the complex mask blank, the use of EUV specific mask tools, and a ramp of yield learning relative to the more mature technologies. This study concludes that, within a range of scenarios, the hypothesis that EUV mask costs are not more than three times that of advanced ArFi masks is valid and conservative.

  15. Absolute quantum yield measurements for the formation of oxygen atoms after UV laser excitation of SO2 at 222.4 nm

    Indian Academy of Sciences (India)

    Mohammed Abu-Bajeh; Melanie Cameron; Kyung-Hoon Jung; Christoph Kappel; Almuth Läuter; Kyoung-Seok Lee; Hari P Upadhyaya; Rajesh K Vatsa; Hans-Robert Volpp

    2002-12-01

    The dynamics of formation of oxygen atoms after UV photoexcitation of SO2 in the gas-phase was studied by pulsed laser photolysis-laser-induced fluorescence `pump-and-probe' technique in a flow reactor. SO2 at room-temperature was excited at the KrCl excimer laser wavelength (222.4 nm) and O(3P) photofragments were detected under collision-free conditions by vacuum ultraviolet laser-induced fluorescence. The use of narrow-band probe laser radiation, generated via resonant third-order sum-difference frequency conversion of dye laser radiation in Krypton, allowed the measurement of the nascent O(3P=2,1,0) fine-structure state distribution: =2/=1/=0 = (0.88 ± 0.02)/(0.10 ± 0.01)/(0.02 ± 0.01). Employing NO2 photolysis as a reference, a value of O(3P) = 0.13 ± 0.05 for the absolute O(3P) atom quantum yield was determined. The measured O(3P) quantum yield is compared with the results of earlier fluorescence quantum yield measurements. A suitable mechanism is suggested in which the dissociation proceeds via internal conversion from high rotational states of the initially excited SO2(∼ 1 B2) (1, 2, 2) vibronic level to nearby continuum states of the electronic ground state.

  16. Comparative mass spectrometric analyses of Photofrin oligomers by fast atom bombardment mass spectrometry, UV and IR matrix-assisted laser desorption/ionization mass spectrometry, electrospray ionization mass spectrometry and laser desorption/jet-cooling photoionization mass spectrometry.

    Science.gov (United States)

    Siegel, M M; Tabei, K; Tsao, R; Pastel, M J; Pandey, R K; Berkenkamp, S; Hillenkamp, F; de Vries, M S

    1999-06-01

    Photofrin (porfimer sodium) is a porphyrin derivative used in the treatment of a variety of cancers by photodynamic therapy. This oligomer complex and a variety of porphyrin monomers, dimers and trimers were analyzed with five different mass spectral ionization techniques: fast atom bombardment, UV and IR matrix-assisted laser desorption/ionization, electrospray ionization, and laser desorption/jet-cooling photoionization. All five approaches resulted in very similar oligomer distributions with an average oligomer length of 2.7 +/- 0.1 porphyrin units. In addition to the Photofrin analysis, this study provides a side-by-side comparison of the spectra for the five different mass spectrometric techniques.

  17. Coherent Diffractive Imaging Using Randomly Coded Masks

    CERN Document Server

    Seaberg, Matthew H; Turner, Joshua J

    2015-01-01

    Coherent diffractive imaging (CDI) provides new opportunities for high resolution X-ray imaging with simultaneous amplitude and phase contrast. Extensions to CDI broaden the scope of the technique for use in a wide variety of experimental geometries and physical systems. Here, we experimentally demonstrate a new extension to CDI that encodes additional information through the use of a series of randomly coded masks. The information gained from the few additional diffraction measurements removes the need for typical object-domain constraints; the algorithm uses prior information about the masks instead. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments. Diffraction patterns are collected with up to 15 different masks placed between a CCD detector and a single sample. Phase retrieval is performed using a convex relaxation routine known as "PhaseCut" followed by a variation on Fienup's input-output algorit...

  18. Mask tuning for process window improvement

    Science.gov (United States)

    Buttgereit, Ute; Birkner, Robert; Graitzer, Erez; Cohen, Avi; Triulzi, Benedetta; Romeo, Carmelo

    2011-03-01

    For the next years optical lithography stays at 193nm with a numerical aperture of 1.35. Mask design becomes more complex, mask and lithography specifications tighten. The k1 factor comes close to 0.25 which leads to a tremendously increased Mask Error Enhancement Factor (MEEF). This means that CD errors on mask are getting highly amplified on wafer. Process control becomes more important than ever. Accurate process control is a key factor to success to maintain a high yield in chip production. One key parameter to ensure a high and reliable functionality for any integrated circuit is the critical dimension uniformity (CDU). There are different contributors which impact the intra-field CD performance at wafer such as mask CD uniformity, scanner fingerprint, resist process etc. In the present work we focus on improvement of mask CD signature which is one of the main contributors to intra-field CD uniformity. The mask CD uniformity has been measured by WLCD32 which measures the CD based on proven aerial image technology. Based on this CD input the CD uniformity was corrected by CDC200TM and afterwards verified by WLCD32 measurement. The CDC200TM tool utilizes an ultrafast femto-second laser to write intra-volume shading elements (Shade-In ElementsTM) inside the bulk material of the mask. By adjusting the density of the shading elements, the light transmission through the mask is locally changed in a manner that improves wafer CDU when the corrected mask is printed. Additionally, the impact of the improved CD uniformity on the lithography process window was investigated. Goal of the work is to establish a process flow for mask CD uniformity improvement based on mask CD metrology by WLCD32 and mask CD uniformity control by CDC200TM and to verify its impact on the lithography process window. The proposed process flow will be validated by wafer prints. It was shown that the WLCD32 has an excellent correlation to wafer data and an outstanding CD repeatability. It provides

  19. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime...... mask using a directional system and a method for correcting errors in the target binary mask. The last part of the thesis, proposes a new method for objective evaluation of speech intelligibility....

  20. Mask industry assessment: 2003

    Science.gov (United States)

    Kimmel, Kurt R.

    2003-12-01

    Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was initiated in 2002 with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition.1 This paper presents the results of the second annual survey which is an enhanced version of the inaugural survey building upon its strengths and improving the weak points. The original survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. The assessment is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the critical mask industry. An objective is to create a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. As subsequent years are added, historical profiles can also be created. This assessment includes inputs from ten major global merchant and captive mask manufacturers representing approximately 80% of the global mask market (using revenue as the measure) and making this the most comprehensive mask industry survey ever. The participating companies are: Compugraphics, Dai Nippon Printing, Dupont Photomask, Hoya, IBM, Infineon, Intel, Taiwan Mask Company, Toppan, and TSMC. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the mask industry.

  1. New UV-A laser-induced fluorescence imaging system for near-field remote sensing of vegetation: characteristics and performance

    Science.gov (United States)

    Sowinska, Malgorzata; Cunin, Bernard; Heisel, Francine; Miehe, Joseph-Albert

    1999-05-01

    In this paper, a compact, new UV-A laser induced fluorescence imaging system implemented in an all-road car for near-field remote sensing of vegetation will be described. It has been developed as a part of a European Community Program INTERREG II* and is consisting of three main parts: excitation, detection and control units. The excitation light pulses (10 ns) are produced by a frequency tripled Nd:YAG laser emitting at 355 nm with a variable repetition rate up to approximately equals 22 kHz and a pulse energy typically of 40 (mu) J. The laser spot size is adjusted by means of a variable beam expander. Fluorescence images are recorded via entrance lenses and 10 nm bandpass filters with a gated intensified digital CCD camera operating at 50 frames per second. The 'head of the system' (laser and camera) can be directed in site and azimuth, and can be high until a 6 meters height. All the functions like the system positioning, localization and distance detection, spot size adjustment, focus, sharpness, selection of the filter, laser and camera synchronization, gain of the intensifier, real time visualization of images, acquisition time are controlled by a newly developed software which also allows image storage, analysis and treatment. Examples of remote sensing fluorescence images recorded at a distance between 10 and 30 m are presented.

  2. Binary mask programmable hologram.

    Science.gov (United States)

    Tsang, P W M; Poon, T-C; Zhou, Changhe; Cheung, K W K

    2012-11-19

    We report, for the first time, the concept and generation of a novel Fresnel hologram called the digital binary mask programmable hologram (BMPH). A BMPH is comprised of a static, high resolution binary grating that is overlaid with a lower resolution binary mask. The reconstructed image of the BMPH can be programmed to approximate a target image (including both intensity and depth information) by configuring the pattern of the binary mask with a simple genetic algorithm (SGA). As the low resolution binary mask can be realized with less stringent display technology, our method enables the development of simple and economical holographic video display.

  3. Detection of genetically modified maize by the polymerase chain reaction and capillary gel electrophoresis with UV detection and laser-induced fluorescence.

    Science.gov (United States)

    García-Cañas, Virginia; González, Ramón; Cifuentes, Alejandro

    2002-02-27

    In this paper, the possibilities of capillary gel electrophoresis (CGE) to detect transgenic maize in flours are shown. The method is based on the extraction and amplification by the polymerase chain reaction (PCR) of a specific DNA fragment from transgenic maize and its subsequent analysis by CGE with UV detection or laser-induced fluorescence (LIF). Some useful considerations regarding the optimization of DNA extraction and amplification conditions are given. Also, a comparison is established between the two CGE protocols for DNA detection based on ultraviolet absorption (CGE-UV) and LIF (CGE-LIF). The requirements, advantages, and limitations of both CGE methods are discussed. To our knowledge, this is the first paper on the use of CGE-LIF to detect transgenic food.

  4. UV-laser microdissection system - A novel approach for the preparation of high-resolution stable isotope records (δ13C/δ18O) from tree rings

    Science.gov (United States)

    Schollaen, Karina; Helle, Gerhard

    2013-04-01

    Intra-annual stable isotope (δ13C and δ18O) studies of tree rings at various incremental resolutions have been attempting to extract valuable seasonal climatic and environmental information or assessing plant ecophysiological processes. For preparing high-resolution isotope samples normally wood segments or cores are mechanically divided in radial direction or cut in tangential direction. After mechanical dissection, wood samples are ground to a fine powder and either cellulose is extracted or bulk wood samples are analyzed. Here, we present a novel approach for the preparation of high-resolution stable isotope records from tree rings using an UV-laser microdissection system. Firstly, tree-ring cellulose is directly extracted from wholewood cross-sections largely leaving the wood anatomical structure intact and saving time as compared to the classical procedure. Secondly, micro-samples from cellulose cross-sections are dissected with an UV-Laser dissection microscope. Tissues of interest from cellulose cross-sections are identified and marked precisely with a screen-pen and dissected via an UV-laser beam. Dissected cellulose segments were automatically collected in capsules and are prepared for stable isotope (δ13C and δ18O) analysis. The new techniques facilitate inter- and intra-annual isotope analysis on tree-ring and open various possibilities for comparisons with wood anatomy in plant eco-physiological studies. We describe the design and the handling of this novel methodology and discuss advantages and constraints given by the example of intra-annual oxygen isotope analysis on tropical trees.

  5. Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

    Science.gov (United States)

    Emoto, Keiji; Sakai, Fumio; Sato, Chiaki; Takabayashi, Yukio; Nakano, Hitoshi; Takabayashi, Tsuneo; Yamamoto, Kiyohito; Hattori, Tadashi; Hiura, Mitsuru; Ando, Toshiaki; Kawanobe, Yoshio; Azuma, Hisanobu; Iwanaga, Takehiko; Choi, Jin; Aghili, Ali; Jones, Chris; Irving, J. W.; Fletcher, Brian; Ye, Zhengmao

    2016-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. Criteria specific to any lithographic process for the semiconductor industry include overlay, throughput and defectivity. The purpose of this paper is to describe the technology advancements made in the reduction of particle adders in an imprint tool and introduce the new mask replication tool that will enable the fabrication of replica masks with added residual image placement errors suitable for memory devices with half pitches smaller than 15nm. Hard particles on a wafer or mask create the possibility of creating a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, test stand results demonstrate the potential for extending mask life to better than 1000 wafers. Additionally, a new replication tool, the FPA-1100 NR2 is introduced. Mask chuck flatness simulation results were also performed and demonstrate that residual image placement errors can be reduced to as little as 1nm.

  6. Mask industry assessment: 2005

    Science.gov (United States)

    Shelden, Gilbert; Hector, Scott

    2005-11-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the fourth in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey contains all of the 2004 survey questions to provide an ongoing database. Additional questions were added to the survey covering operating cost factors and equipment utilization. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors and equipment utilization. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market. This participation rate is reduced by one captive from 2004. Note: Toppan, DuPont Photomasks Inc and AMTC (new) were consolidated into one input therefore the 2004 and 2005 surveys are basically equivalent.

  7. 面曝光快速成形激光液位检测系统的研究%Research of laser liquid level detection system of mask projection stereolithography

    Institute of Scientific and Technical Information of China (English)

    闫达海; 胥光申

    2013-01-01

    为了精确地掌握和控制面曝光快速成形系统中的树脂液位,使其保持在工作面上,设计了激光液位检测系统;根据激光三角法测量原理,选用红光半导体激光器为光源,利用位置传感器(PSD)获取反射光斑位置变化的信号来检测液位高度.实验表明:在量程为6 mm时,误差仅为0.34%,可以精确地检测树脂液面.%In order to control accurately the resin liquid level of mask projection stereolithography system, the laser liquid level detection system is designed. According to the measuring principle of laser triangulation, the system chooses the red light semiconductor lasers as the light source and use Position Sensitive Detectors (PSD) to detect liquid level height with the changing signal of reflection flare's position. The experimental result indicates that in the range of 6 mm, deviation is just 0.34%, which can accurately detect resin liquid surface.

  8. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  9. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  10. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  11. Deep-UV 236.5  nm laser by fourth-harmonic generation of a single-crystal fiber Nd:YAG oscillator.

    Science.gov (United States)

    Deyra, Loïc; Martial, Igor; Didierjean, Julien; Balembois, François; Georges, Patrick

    2014-04-15

    We demonstrate a deep-UV laser at 236.5 nm based on extracavity fourth-harmonic generation of a Q-switched Nd:YAG single-crystal fiber laser at 946 nm. We first compare two nonlinear crystals available for second-harmonic generation: LBO and BiBO. The best results at 473 nm are obtained with a BiBO crystal, with an average output power of 3.4 W at 20 kHz, corresponding to a second-harmonic generation efficiency of 38%. This blue laser is frequency-converted to 236.5 nm in a BBO crystal with an overall fourth-harmonic generation yield of 6.5%, corresponding to an average output power of 600 mW at 20 kHz. This represents an order of magnitude increase in average power and energy compared to previously reported pulsed lasers at 236.5 nm. This work opens the possibility of LIDAR detection of dangerous compounds for military or civilian applications.

  12. Initial state-specific photodissociation dynamics of pyrrole via 1 π σ ∗/ S 0 conical intersection initiated with optimally controlled UV-laser pulses

    Science.gov (United States)

    Nandipati, K. R.; Kanakati, Arun Kumar; Singh, H.; Lan, Z.; Mahapatra, S.

    2017-09-01

    Optimal initiation of quantum dynamics of N-H photodissociation of pyrrole on the S 0-1 π σ ∗(1 A 2) coupled electronic states by UV-laser pulses in an effort to guide the subsequent dynamics to dissociation limits is studied theoretically. Specifically, the task of designing optimal laser pulses that act on initial vibrational states of the system for an effective UV-photodissociation is considered by employing optimal control theory. The associated control mechanism(s) for the initial state dependent photodissociation dynamics of pyrrole in the presence of control pulses is examined and discussed in detail. The initial conditions determine implicitly the variation in the dissociation probabilities for the two channels, upon interaction with the field. The optimal pulse corresponds to the objective fixed as maximization of overall reactive flux subject to constraints of reasonable fluence and quantum dynamics. The simple optimal pulses obtained by the use of genetic algorithm based optimization are worth an experimental implementation given the experimental relevance of π σ ∗-photochemistry in recent times.

  13. Experimental capabilities of the GARPUN MTW Ti : sapphire - KrF laser facility for investigating the interaction of subpicosecond UV pulses with targets

    Science.gov (United States)

    Zvorykin, V. D.; Goncharov, S. A.; Ionin, A. A.; Mokrousova, D. V.; Ryabchuk, S. V.; Seleznev, L. V.; Sunchugasheva, E. S.; Ustinovskii, N. N.; Shutov, A. V.

    2017-05-01

    This paper describes the first experiments carried out on the GARPUN MTW Ti : sapphire - KrF hybrid laser facility and aimed at gaining insight into the interaction of subpicosecond UV pulses with solid and structured low-density carbon nanotube targets at peak intensities of ~1016 W cm-2 in a focal spot ~70 μm in size. Using X-ray absorbers, the plasma electron temperature has been measured to be ~850 eV. In our experiments, we used an optimal configuration: direct double-pass ultrashort-pulse (USP) amplification in KrF amplifier stages, with multiple laser beam filamentation suppression in a xenon-filled cell. The highest energy on a target was 0.25 J at a USP contrast relative to amplified spontaneous emission of ~3 × 1010 for intensities and ~3 × 105 for fluences. Owing to two-photon resonance in the UV spectral region, the use of xenon, with a negative nonlinear refractive index, allowed us to make the cross-sectional fluence distribution more uniform and reduce the beam divergence to 0.14 mrad (at the 10 % intensity level). Reducing the USP duration via negatively chirped pulse amplification and filamentation suppression and reducing the focal spot size on a target by using parabolic short-focus optics are expected to ensure an increase in the intensity incident on the target by one to two orders of magnitude. Presented at the ECLIM 2016 conference (Moscow, 18 - 23 September 2016.

  14. Ferromagnetic shadow mask for spray coating of polymer patterns

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Bosco, Filippo; Boisen, Anja

    2013-01-01

    We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties of the sha...... of the shadow mask allow magnetic clamping to the substrate and spray coating of well defined polymer patterns....

  15. Dependence of ablation threshold and LIPSS formation on copper thin films by accumulative UV picosecond laser shots

    Science.gov (United States)

    Huynh, Thi Trang Dai; Semmar, Nadjib

    2014-09-01

    The ablation threshold and Laser-induced periodic surface structure (LIPSS) formation on copper thin film were investigated using a picosecond laser (Nd:YAG laser: 266 nm, 42 ps, 10 Hz). We show that the ablation threshold varies with respect to the number of laser shots ( N) on two different substrates. The single-shot ablation threshold was estimated to be close to 170 ± 20 mJ/cm2. The incubation coefficient was estimated to be 0.68 ± 0.03 for copper thin films on silicon and glass substrates. In addition, morphology changes of the ablated regions, in the same spot area, were studied as a function of fluence and number of laser shots. An intermediate structure occurred with a mix of low spatial frequency LIPSS (LSFL), high spatial frequency LIPSS (HSFL) and regular spikes at a fluence F LIPSS formation was established in the form of a 2D map.

  16. Insulator Surface Flashover Due to UV Illumination

    Energy Technology Data Exchange (ETDEWEB)

    Javedani, J B; Houck, T L; Lahowe, D A; Vogtlin, G E; Goerz, D A

    2009-07-27

    The surface of an insulator under vacuum and under electrical charge will flashover when illuminated by a critical dose of ultra-violet (UV) radiation - depending on the insulator size and material, insulator cone angle, the applied voltage and insulator shot-history. A testbed comprised of an excimer laser (KrF, 248 nm, {approx}16 MW, 30 ns FWHM,), a vacuum chamber, and a negative polarity dc high voltage power supply ({le} -60 kV) were assembled to test 1.0 cm thick angled insulators for surface-flashover. Several candidate insulator materials, e.g. High Density Polyethylene (HDPE), Rexolite{reg_sign} 1400, Macor{trademark} and Mycalex, of varying cone angles were tested against UV illumination. Commercial energy meters were used to measure the UV fluence of the pulsed laser beam. In-house designed and fabricated capacitive probes (D-dots, >12 GHz bandwidth) were embedded in the anode electrode underneath the insulator to determine the time of UV arrival and time of flashover. Of the tested insulators, the +45 degree Rexolite insulator showed more resistance to UV for surface flashover; at UV fluence level of less than 13 mJ/cm{sup 2}, it was not possible to induce a flashover for up to -60 kV of DC potential across the insulator's surface. The probes also permitted the electrical charge on the insulator before and after flashover to be inferred. Photon to electron conversion efficiency for the surface of Rexolite insulator was determined from charge-balance equation. In order to understand the physical mechanism leading to flashover, we further experimented with the +45 degree Rexolite insulator by masking portions of the UV beam to illuminate only a section of the insulator surface; (1) the half nearest the cathode and subsequently, (2) the half nearest the anode. The critical UV fluence and time to flashover were measured and the results in each case were then compared with the base case of full-beam illumination. It was discovered that the time for the

  17. Grayscale lithography-automated mask generation for complex three-dimensional topography

    Science.gov (United States)

    Loomis, James; Ratnayake, Dilan; McKenna, Curtis; Walsh, Kevin M.

    2016-01-01

    Grayscale lithography is a relatively underutilized technique that enables fabrication of three-dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially modulating ultraviolet (UV) dosage during the writing process, one can vary the depth at which photoresist is developed. This means complex structures and bioinspired designs can readily be produced that would otherwise be cost prohibitive or too time intensive to fabricate. The main barrier to widespread grayscale implementation, however, stems from the laborious generation of mask files required to create complex surface topography. We present a process and associated software utility for automatically generating grayscale mask files from 3-D models created within industry-standard computer-aided design (CAD) suites. By shifting the microelectromechanical systems (MEMS) design onus to commonly used CAD programs ideal for complex surfacing, engineering professionals already familiar with traditional 3-D CAD software can readily utilize their pre-existing skills to make valuable contributions to the MEMS community. Our conversion process is demonstrated by prototyping several samples on a laser pattern generator-capital equipment already in use in many foundries. Finally, an empirical calibration technique is shown that compensates for nonlinear relationships between UV exposure intensity and photoresist development depth as well as a thermal reflow technique to help smooth microstructure surfaces.

  18. Surface nanopatterning of Al/Ti multilayer thin films and Al single layer by a low-fluence UV femtosecond laser beam

    Energy Technology Data Exchange (ETDEWEB)

    Kovačević, Aleksander G., E-mail: Aleksander.Kovacevic@ipb.ac.rs [Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Beograd (Serbia); Petrović, Suzana [Institute of Nuclear Sciences “Vinča”, University of Belgrade, PO Box 522, 11001 Belgrade (Serbia); Bokić, Bojana [Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Beograd (Serbia); Gaković, Biljana [Institute of Nuclear Sciences “Vinča”, University of Belgrade, PO Box 522, 11001 Belgrade (Serbia); Bokorov, Miloš T. [Center for Electron Microscopy, University of Novi Sad, Trg Dositeja Obradovića 2, 21000 Novi Sad (Serbia); Vasić, Borislav; Gajić, Radoš [Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Beograd (Serbia); Trtica, Milan [Institute of Nuclear Sciences “Vinča”, University of Belgrade, PO Box 522, 11001 Belgrade (Serbia); Jelenković, Branislav M. [Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Beograd (Serbia)

    2015-01-30

    Highlights: • Femtosecond laser beam was applied to multilayer Al/Ti and single layer Al thin film. • The evolution of laser induced periodic surface structures and its causes is explained. • The structures remained stable after great number of pulses. • The different outcomes of the two cases (single and multilayer) have been explained in the light of the presence of the Ti underlayer. - Abstract: The effects of UV femtosecond laser beam with 76 MHz repetition rate on two types of thin films on Si substrate – the Al single layer thin film, and the multilayered thin film consisted of five Al/Ti bilayers (total thickness 130 nm) – were studied. The surface modification of the target was done by low fluences and different irradiation times, not exceeding ∼300 s. Nanopatterns in the form of femtosecond-laser induced periodic surface structures (fs-LIPSS) with periodicity of <315 nm and height of ∼45 nm were registered upon irradiation of the thin films. It was shown that: (i) the fs-LIPSS evolve from ruffles similar to high spatial frequency LIPSS (HSFL) into a low spatial frequency LIPSS (LSFL) if a certain threshold of the fluence is met, (ii) the number of LSFL increases with the exposition time and (iii) the LSFL remain stable even after long exposure times. We achieved high-quality highly-controllable fabrication of periodic structures on the surface of nanosized multilayer films with high-repetition-rate low-fluence femtosecond laser pulses. Compared to the Al single layer, the presence of the Ti underlayer in the Al/Ti multilayer thin film enabled more efficient heat transmittance through the Al/Ti interface away from the interaction zone which caused the reduction of the ablation effects leading to the formation of more regular LIPSS. The different outcomes of interactions with multi and single layer thin films lead to the conclusion that the behavior of the LIPSS is due to thin film structure.

  19. Gilded Silver Mask

    Institute of Scientific and Technical Information of China (English)

    1998-01-01

    This gilded silver mask from the Liao Dynasty is 31 cm long and 22.2 cm wide. The plump oval face was designed with a protruding brow ridge, narrow eyes, high-bridged nose and closed mouth. The chin is slightly round against a thin neck, the ears are long and the hair can be clearly seen from the finely carved lines. The use of masks was recorded as

  20. New mask technology challenges

    Science.gov (United States)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  1. Cavity-enhanced absorption spectroscopy with a ps-pulsed UV laser for sensitive, high-speed measurements in a shock tube.

    Science.gov (United States)

    Wang, Shengkai; Sun, Kai; Davidson, David F; Jeffries, Jay B; Hanson, Ronald K

    2016-01-11

    We report the first application of cavity-enhanced absorption spectroscopy (CEAS) with a ps-pulsed UV laser for sensitive and rapid gaseous species time-history measurements in a transient environment (in this study, a shock tube). The broadband nature of the ps pulses enabled instantaneous coupling of the laser beam into roughly a thousand cavity modes, which grants excellent immunity to laser-cavity coupling noise in environments with heavy vibrations, even with an on-axis alignment. In this proof-of-concept experiment, we demonstrated an absorption gain of 49, which improved the minimum detectable absorbance by ~20 compared to the conventional single-pass strategy at similar experimental conditions. For absorption measurements behind reflected shock waves, an effective time-resolution of ~2 μs was achieved, which enabled time-resolved observations of transient phenomena, such as the vibrational relaxation of O(2) demonstrated here. The substantial improvement in detection sensitivity, together with microsecond measurement resolution implies excellent potential for studies of transient physical and chemical processes in nonequilibrium situations, particularly via measurements of weak absorptions of trace species in dilute reactive systems.

  2. Surface nanopatterning of Al/Ti multilayer thin films and Al single layer by a low-fluence UV femtosecond laser beam

    Science.gov (United States)

    Kovačević, Aleksander G.; Petrović, Suzana; Bokić, Bojana; Gaković, Biljana; Bokorov, Miloš T.; Vasić, Borislav; Gajić, Radoš; Trtica, Milan; Jelenković, Branislav M.

    2015-01-01

    The effects of UV femtosecond laser beam with 76 MHz repetition rate on two types of thin films on Si substrate - the Al single layer thin film, and the multilayered thin film consisted of five Al/Ti bilayers (total thickness 130 nm) - were studied. The surface modification of the target was done by low fluences and different irradiation times, not exceeding ∼300 s. Nanopatterns in the form of femtosecond-laser induced periodic surface structures (fs-LIPSS) with periodicity of LIPSS evolve from ruffles similar to high spatial frequency LIPSS (HSFL) into a low spatial frequency LIPSS (LSFL) if a certain threshold of the fluence is met, (ii) the number of LSFL increases with the exposition time and (iii) the LSFL remain stable even after long exposure times. We achieved high-quality highly-controllable fabrication of periodic structures on the surface of nanosized multilayer films with high-repetition-rate low-fluence femtosecond laser pulses. Compared to the Al single layer, the presence of the Ti underlayer in the Al/Ti multilayer thin film enabled more efficient heat transmittance through the Al/Ti interface away from the interaction zone which caused the reduction of the ablation effects leading to the formation of more regular LIPSS. The different outcomes of interactions with multi and single layer thin films lead to the conclusion that the behavior of the LIPSS is due to thin film structure.

  3. Optical inspection of EPL stencil masks

    Science.gov (United States)

    Lee, Po-Tung; Engelstad, Roxann L.; Lovell, Edward G.; Kawata, Shintaro; Hirayanagi, Noriyuki; Sogard, Michael R.

    2003-06-01

    We are now at a major junction in lithography where non-optical lithographies, such as Electron Projection Lithography (EPL) [1], are being introduced. The mask used in EPL is a non-transparent silicon substrate with a thin silicon (~2μm) membrane with openings for electrons to pass through acting as a scatterer. This must be inspected as defects may cause printable defects. Initial mask inspection work has used SEM inspection to find these defects. However, we have historically used optical mask inspection tools, utilising wavelengths at or above what we are using for imaging, to qualify masks. This technology has been increasingly difficult to sustain as we have moved from imaging using mercury lamp based sources to pulsed excimer laser based sources that are not very suited to the inspection imaging. Indeed, review of defects found has moved from optical microscopes to SEM based tools. Inspection tools have also evolved, with the first SEM based mask inspection tools being developed to find the smallest defects, however these have the penalty of very low throughput. We will show the potential of using optical systems for the transmissive inspection of these EPL masks. The high potential of existing tools will be shown together with the need for a next generation of inspection tools. We will show that simulations indicate that an inspection source with 193nm wavelength would be required for the detection of 50nm defects on a mask used to print 70nm dense lines. It will also be shown how the position of the defect within the membrane greatly influences detection as well as the implications of moving to a thinner silicon membrane.

  4. Comparative evaluation of UV-vis-IR Nd:YAG laser cleaning of beeswax layers on granite substrates

    Energy Technology Data Exchange (ETDEWEB)

    Pan, A., E-mail: aldarapan@uvigo.es [Departamento de Fisica Aplicada, E.T.S.I Industriales, Universidad de Vigo, Rua Maxwell s/n. Campus Universitario Lagoas-Marcosende, E-36310 Vigo (Spain); Chiussi, S.; Gonzalez, P.; Serra, J.; Leon, B. [Departamento de Fisica Aplicada, E.T.S.I Industriales, Universidad de Vigo, Rua Maxwell s/n. Campus Universitario Lagoas-Marcosende, E-36310 Vigo (Spain)

    2011-04-15

    The beeswax treatment applied in the sixties to prevent rain water from penetrating the outer stone surface of valuable granitic Galician monuments is contributing to the acceleration of the superficial degradation process of these monuments. At present, the northern sector of the renaissance frieze in the Cloister of the Cathedral of Santiago de Compostela is one of the most representative examples. Conventional wax removal methods (water, chemical and mechanical cleaning) can possibly destruct important details of the relief. Therefore laser removal is considered as a good alternative. In this work, we report systematic investigations of the effect of laser cleaning at different Nd:YAG laser wavelengths (266, 355, 532 and 1064 nm) on representative samples of the real historical surfaces. Laser removal of beeswax on granite at neither of the four wavelengths of the Nd:YAG laser is not a layer by layer removal process. For each irradiance and wavelength there is a maximum thickness that can be completely removed by a single pulse. Above this thickness the waxy material is not removed, although it undergoes thermal modifications; since the fraction of radiation that reaches the granite substrate is not enough to trigger the ejection of material. Our results show that the wax-granite interface plays a fundamental role in granite cleaning, and when the wax is weakened by absorption of radiation at 266 nm, the removal process becomes more efficient.

  5. Comparative evaluation of UV-vis-IR Nd:YAG laser cleaning of beeswax layers on granite substrates

    Science.gov (United States)

    Pan, A.; Chiussi, S.; González, P.; Serra, J.; León, B.

    2011-04-01

    The beeswax treatment applied in the sixties to prevent rain water from penetrating the outer stone surface of valuable granitic Galician monuments is contributing to the acceleration of the superficial degradation process of these monuments. At present, the northern sector of the renaissance frieze in the Cloister of the Cathedral of Santiago de Compostela is one of the most representative examples. Conventional wax removal methods (water, chemical and mechanical cleaning) can possibly destruct important details of the relief. Therefore laser removal is considered as a good alternative. In this work, we report systematic investigations of the effect of laser cleaning at different Nd:YAG laser wavelengths (266, 355, 532 and 1064 nm) on representative samples of the real historical surfaces. Laser removal of beeswax on granite at neither of the four wavelengths of the Nd:YAG laser is not a layer by layer removal process. For each irradiance and wavelength there is a maximum thickness that can be completely removed by a single pulse. Above this thickness the waxy material is not removed, although it undergoes thermal modifications; since the fraction of radiation that reaches the granite substrate is not enough to trigger the ejection of material. Our results show that the wax-granite interface plays a fundamental role in granite cleaning, and when the wax is weakened by absorption of radiation at 266 nm, the removal process becomes more efficient.

  6. Mask Blank Defect Detection

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask

  7. A tunable CW UV laser with <35 kHz absolute frequency instability for precision spectroscopy of Sr Rydberg states

    CERN Document Server

    Bridge, Elizabeth M; Bounds, Alistair D; Boddy, Danielle; Sadler, Daniel P; Jones, Matthew P A

    2015-01-01

    We present a solid-state laser system that generates over 200 mW of continuous-wave, narrowband light, tunable between 316.3 nm and 319.3 nm. The laser is based on commercially available fiber amplifiers and optical frequency doubling technology, along with sum frequency generation in a periodically poled stoichiometric lithium tantalate crystal. The laser frequency is stabilized to an atomic-referenced high finesse optical transfer cavity. Using a GPS-referenced optical frequency comb we measure a long term frequency instability of <35 kHz. As an application we perform spectroscopy of Sr Rydberg states from n = 37 - 81, demonstrating mode-hop-free scans of 24 GHz. In a cold atomic sample we measure Doppler-limited linewidths of 350 kHz.

  8. Evaluation of laser desorption mass spectrometry and UV accelerated aging of dyes on paper as tools for the evaluation of a questioned document.

    Science.gov (United States)

    Grim, Donzna M; Siegel, Jay; Allison, John

    2002-11-01

    Laser desorption mass spectrometry (LDMS) may be used for the detection and identification of dyes found in inks. Naturally-aged and artificially-aged blue and black ballpoint pen inks containing the cationic dye methyl violet were analyzed on paper. The average molecular weight of the dye sample was calculated from LD mass spectral data and plotted versus time. The resulting aging curves demonstrate that, as dye degradation increases, the average molecular weight of the dye decreases. Typical variables involved in ink aging, such as the type of paper and ink formulation, were investigated. Results show that these variables influence the rate of dye degradation. Furthermore, UV accelerated aging has been developed and tested as an alternative to thermal approaches.

  9. Laser uv microirradiation of interphase nuclei and post-treatment with caffeine. A new approach to establish the arrangement of interphase chromosomes

    Energy Technology Data Exchange (ETDEWEB)

    Zorn, C.; Cremer, T.; Cremer, C.; Zimmer, J.

    1976-12-29

    Laser uv microirradiation of Chinese hamster interphase cells combined with caffeine post-treatment produced different patterns of chromosome damage in mitosis following irradiation of a small area of the nucleus that may be classified in three categories: (I) intact metaphase figures, (II) chromosome damage confined to a small area of the metaphase spread, (III) mitotic figures with damage on all chromosomes. Category III might be the consequence of a non-localized distortion of nuclear metabolism. By contrast, category II may reflect localized DNA damage induced by microirradiation, which could not be efficiently repaired due to the effect of caffeine. If this interpretation is right, in metaphase figures of category II chromosome damage should occur only at the irradiation site. The effect might then be used to investigate neighbourhood relationships of individual chromosomes in the interphase nucleus.

  10. Laser ablation of toluene liquid for surface micro-structuring of silica glass

    Energy Technology Data Exchange (ETDEWEB)

    Niino, H. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan)]. E-mail: niino.hiro@aist.go.jp; Kawaguchi, Y. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan); Sato, T. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan); Narazaki, A. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan); Gumpenberger, T. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan); Kurosaki, R. [Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan)

    2006-04-30

    Microstructures with well-defined micropatterns were fabricated on the surfaces of silica glass using a laser-induced backside wet etching (LIBWE) method by diode-pumped solid state (DPSS) UV laser at the repetition rate of 10 kHz. For a demonstration of flexible rapid prototyping as mask-less exposure system, the focused laser beam was directed to the sample by galvanometer-based point scanning system. Additionally, a diagnostics study of plume propagation in the ablated products of toluene solid film was carried out with an intensified CCD (ICCD) camera.

  11. Overview of Mask Metrology

    Science.gov (United States)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  12. [The laryngeal mask].

    Science.gov (United States)

    Poltroniéri, J

    1990-01-01

    A new type of airway has been widely used for two years, throughout hospitals in the United Kingdom. Designed and created since 1983 by Dr AIJ Brain, the Laryngeal Mask Airway (LMA) is a compromise between the endotracheal tube and the face-mask. Blindly inserted in an anaesthetized patient, without either a laryngoscope or neuromuscular blockade, it provides a good airway in almost all cases. It is often able to offer an effective alternative to difficult intubation. The LMA can be used with either spontaneous or positive pressure ventilation. Because it doesn't provide a reliable protection of the airway from aspiration, it should never be used in the patient with a full stomach. The spontaneously breathing patient, undergoing elective surgery for 15 to 60 minutes, in supine position, who would ordinarily be managed with a face-mask is the more likely candidate for the LMA. But, longer procedures, in lateral or prone position, with controlled ventilation can usually be carried out using the Brain's device. More effective and less demanding than the facial-mask, much less hurtful than the endotracheal tube, the Laryngeal Mask is potentially an important and valuable addition to anaesthetic care.

  13. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  14. Study of the damage induced in the DNA by 21,2 nm X-UV laser radiation; Etude des dommages induits dans l'ADN par irradiation laser X-UV a 21.2

    Energy Technology Data Exchange (ETDEWEB)

    Cassou, K.; Ros, D.; Kazamias, S.; Klinsnick, A.; Jamelot, G.; Guilbaud, O. [Paris-11 Univ., Lab. d' Interaction du Rayonnement X avec la Matiere, LIXAM, CNRS UMR 8624, 91 - Orsay (France); Rus, B.; Kozlova, M.; Polan, J.; Prag, A.R.; Stupka, M. [Institute of Physics, Academy of Sciences of the Czech Republic, Dept. of X-ray Laser/PALS Centre, Prague (Czech Republic); Eot-Houllier, G.; Sage, E. [Paris-11 Univ., Lab. de Genotoxicologie et Cycle Cellulaire, Institut Curie, CNRS UMR 2027, 91 - Orsay (France); Begusova, M.; Stisova, V. [Academy of Sciences of the Czech Republic, Nuclear Physics Institute, Prague (Czech Republic); Penhoat, M.A.H. du; Touati, A.; Chetioui, A. [Paris-6 Univ. et Paris-7 Univ., Groupe de Physique des Solides, CNRS UMR 7588, 75 (France)

    2005-06-01

    We report the preliminary result of the application of the collisional Ne-like soft X-ray laser as radiation source to induce DNA damage. The goal of this experiment was a test bed study of the damage yields induced by soft x-ray radiation in dried plasmid DNA sample. The saturated Ne-like soft x-ray laser available at the PALS facility, delivering several milli-joules in a single 100 ps pulse at 21.2 nm was used to irradiate two different plasmids: pSP189 and pBS. The study is centered on the dose effect leading to single and double strand break in DNA. (authors)

  15. A Compact, Solid-State UV (266 nm) Laser System Capable of Burst-Mode Operation for Laser Ablation Desorption Processing

    Science.gov (United States)

    Arevalo, Ricardo, Jr.; Coyle, Barry; Paulios, Demetrios; Stysley, Paul; Feng, Steve; Getty, Stephanie; Binkerhoff, William

    2015-01-01

    Compared to wet chemistry and pyrolysis techniques, in situ laser-based methods of chemical analysis provide an ideal way to characterize precious planetary materials without requiring extensive sample processing. In particular, laser desorption and ablation techniques allow for rapid, reproducible and robust data acquisition over a wide mass range, plus: Quantitative, spatially-resolved measurements of elemental and molecular (organic and inorganic) abundances; Low analytical blanks and limits-of-detection ( ng g-1); and, the destruction of minimal quantities of sample ( g) compared to traditional solution and/or pyrolysis analyses (mg).

  16. Development of Adaptive Feedback Control System of Both Spatial and Temporal Beam Shaping for UV-Laser Light Source for RF Gun

    CERN Document Server

    Tomizawa, H; Dewa, H; Hanaki, H; Kobayashi, T; Mizuno, A; Suzuki, S; Taniuchi, T; Yanagida, K

    2004-01-01

    The ideal spatial and temporal profiles of a shot-by-shot single laser pulse are essential to suppress the emittance growth of the electron beam from a photo-cathode rf gun. We have been developing highly qualified UV-laser pulse as a light source of the rf gun for an injector candidate of future light sources. The gun cavity is a single-cell pillbox, and the copper inner wall is used as a photo cathode. The electron beam was accelerated up to 4.1 MeV at the maximum electric field on the cathode surface of 175 MV/m. For emittance compensation, two solenoid coils were used. As the first test run, with a microlens array as a simple spatial shaper, we obtained a minimum emittance value of 2 π·mm·mrad with a beam energy of 3.1 MeV, holding its charge to 0.1 nC/bunch. In the next test run, we prepared a deformable mirror for spatial shaping, and a spatial light modulator based on fused-silica plates for temporal shaping. We applied the both adaptive optics to automatically shape the bot...

  17. Thermalization of a UV laser ablation plume in a background gas: From a directed to a diffusionlike flow

    DEFF Research Database (Denmark)

    Amoruso, S.; Toftmann, B.; Schou, Jørgen

    2004-01-01

    Combined diagnostic measurements of deposition rates and ion time-of-flight signals have been employed to study the expansion of a laser ablation plume into a background gas. With increasing gas pressure the angular distribution of the collected ablated atoms becomes broader, while the total....... In the high-pressure regime the expansion can be described by a simple model based on diffusion from a confined plume....

  18. Characterization of laser-driven single and double electron bunches with a permanent magnet quadrupole triplet and pepper-pot mask

    Science.gov (United States)

    Manahan, G. G.; Brunetti, E.; Aniculaesei, C.; Anania, M. P.; Cipiccia, S.; Islam, M. R.; Grant, D. W.; Subiel, A.; Shanks, R. P.; Issac, R. C.; Welsh, G. H.; Wiggins, S. M.; Jaroszynski, D. A.

    2014-10-01

    Electron beams from laser-plasma wakefield accelerators have low transverse emittance, comparable to those from conventional radio frequency accelerators, which highlights their potential for applications, many of which will require the use of quadrupole magnets for optimal electron beam transport. We report on characterizing electron bunches where double bunches are observed under certain conditions. In particular, we present pepper-pot measurements of the transverse emittance of 120-200 MeV laser wakefield electron bunches after propagation through a triplet of permanent quadrupole magnets. It is shown that the normalized emittance at source can be as low as 1 π mm mrad (resolution limited), growing by about five times after propagation through the quadrupoles due to beam energy spread. The inherent energy-dependence of the magnets also enables detection of double electron bunches that could otherwise remain unresolved, providing insight into the self-injection of multiple bunches. The combination of quadrupoles and pepper-pot, in addition, acts as a diagnostic for the alignment of the magnetic triplet.

  19. Growth and modification of thin SiGeC films at low substrate temperatures through UV laser assisted processing

    Science.gov (United States)

    López, E.; Chiussi, S.; Serra, J.; González, P.; Serra, C.; Kosch, U.; León, B.; Fabbri, F.; Fornarini, L.; Martelli, S.

    2004-07-01

    Enhancing the performance of solar cells, near infrared photo-detectors and microelectronic devices through band gap engineering caused an increasing attention in processes for growing thin silicon germanium carbon (SiGeC) films in a wide range of composition and crystalline structures. Moreover, the demand of using cheap substrates and the development of new devices with advanced materials like "high- k dielectrics" and "organic materials" implies the need of new processes avoiding high substrate temperatures that may decompose or alter the substrate materials, crystallise part of the heterostructures or promote segregation effects. Laser induced chemical vapour deposition (LCVD) and excimer laser assisted crystallisation (ELC) are such alternative and relatively cheap "low thermal budget" techniques that, in addition, are compatible with conventional IC silicon technology. The present study will show the possibility of tailoring the composition of amorphous SiGeC coatings through the adjustment of gas flow rates in LCVD processes performed at substrate temperatures between 180 and 400 °C. The modification of an amorphous film through a subsequent ELC process performed at room temperature is analysed through SEM and depth profile XPS in order to study the effects of controlled laser radiation on it, as well as on a very thin underlaying interfacial SiO 2 layer and on the Si(1 0 0) substrate.

  20. Comparison of univariate and multivariate models for prediction of major and minor elements from laser-induced breakdown spectra with and without masking

    Science.gov (United States)

    Dyar, M. Darby; Fassett, Caleb I.; Giguere, Stephen; Lepore, Kate; Byrne, Sarah; Boucher, Thomas; Carey, CJ; Mahadevan, Sridhar

    2016-09-01

    This study uses 1356 spectra from 452 geologically-diverse samples, the largest suite of LIBS rock spectra ever assembled, to compare the accuracy of elemental predictions in models that use only spectral regions thought to contain peaks arising from the element of interest versus those that use information in the entire spectrum. Results show that for the elements Si, Al, Ti, Fe, Mg, Ca, Na, K, Ni, Mn, Cr, Co, and Zn, univariate predictions based on single emission lines are by far the least accurate, no matter how carefully the region of channels/wavelengths is chosen and despite the prominence of the selected emission lines. An automated iterative algorithm was developed to sweep through all 5485 channels of data and select the single region that produces the optimal prediction accuracy for each element using univariate analysis. For the eight major elements, use of this technique results in a 35% improvement in prediction accuracy; for minors, the improvement is 13%. The best wavelength region choice for any given univariate analysis is likely to be an inherent property of the specific training set that cannot be generalized. In comparison, multivariate analysis using partial least-squares (PLS) almost universally outperforms univariate analysis. PLS using all the same wavelength regions from the univariate analysis produces results that improve in accuracy by 63% for major elements and 3% for minor element. This difference is likely a reflection of signal to noise ratios, which are far better for major elements than for minor elements, and likely limit their prediction accuracy by any technique. We also compare predictions using specific wavelength ranges for each element against those employing all channels. Masking out channels to focus on emission lines from a specific element that occurs decreases prediction accuracy for major elements but is useful for minor elements with low signals and proportionally much higher noise; use of PLS rather than univariate

  1. LIC and LID considerations in the design and implementation of the MEMS laser pointing mechanism for the EUSO UV laser altimeter

    CERN Document Server

    Bozzo, Enrico; Ciapponi, Alessandra; Heese, Clemens; Hoogerwerf, Arno; Lan, Nicholas; Neronov, Andrii; Revol, Vincent; Stanley, Ross

    2016-01-01

    The EUSO (Extreme Universe Space Observatory) project is developing a new mission concept for the scientific research of Ultra High Energy Cosmic Rays (UHECRs) from space. The EUSO wide-field telescope will look down from space onto the Earth night sky to detect UV photons emitted from air showers generated by UHECRs in our atmosphere. In this article we concentrate on the mitigation strategies agreed so far, and in particular on the implementation of a careful early selection and testing of subsystem materials (including optics), design and interfaces of the subsystem and an optimization of the instrument operational concept.

  2. LIC and LID considerations in the design and implementation of the MEMS laser pointing mechanism for the EUSO UV laser altimeter

    Science.gov (United States)

    Bozzo, Enrico; Burch, Thomas; Ciapponi, Alessandra; Heese, Clemens; Hoogerwerf, Arno; Lan, Nicholas; Neronov, Andrii; Revol, Vincent; Stanley, Ross

    2016-07-01

    The EUSO (Extreme Universe Space Observatory) project is developing a new mission concept for the scientific research of Ultra High Energy Cosmic Rays (UHECRs) from space. The EUSO wide-field telescope will look down from space onto the Earth night sky to detect UV photons emitted from air showers generated by UHECRs in our atmosphere. In this article we concentrate on the mitigation strategies agreed so far, and in particular on the implementation of a careful early selection and testing of subsystem materials (including optics), design and interfaces of the subsystem and an optimization of the instrument operational concept.

  3. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  4. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  5. Masked mycotoxins: a review.

    Science.gov (United States)

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders.

  6. Green binary and phase shifting mask

    Science.gov (United States)

    Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang

    2009-12-01

    SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).

  7. CADAT integrated circuit mask analysis

    Science.gov (United States)

    1981-01-01

    CADAT System Mask Analysis Program (MAPS2) is automated software tool for analyzing integrated-circuit mask design. Included in MAPS2 functions are artwork verification, device identification, nodal analysis, capacitance calculation, and logic equation generation.

  8. High-average-power high-beam-quality vis-UV sources based on kinetically enhanced copper vapor lasers

    Science.gov (United States)

    Brown, Daniel J. W.; Withford, Michael J.; Carman, Robert J.; Mildren, Richard P.; Piper, James A.

    2000-04-01

    Investigations of the factors that limit average power scaling of elemental copper vapor lasers (CVLs) have demonstrated that decay of the electron density in the interpulse period is critical in restricting pulse repetition rate and laser aperture scaling. We have recently developed the 'kinetic enhancement' (or KE) technique to overcome these limitations, whereby optimal plasma conditions are engineered using low concentrations of HCl/H2 additive gases in the Ne buffer. Dissociative electron attachment of HCl and subsequent mutual neutralization of Cl- and Cu+ promote rapid plasma relaxation and fast recovery of Cu densities, permitting operation at elevated Cu densities and pulse rates for given apertures. Using this approach, we have demonstrated increases in output power and efficiency of a factor of 2 or higher over conventional CVLs of the same size. For a 38 mm- bore KE-CVL, output powers up to 150 W have been achieved at 22 kHz, corresponding to record specific powers (80 mW/cm3) for such a 'small/medium-scale' device. In addition, kinetic enhancement significantly extends the gain duration and restores gain on-axis, even for high pulse rates, thereby promoting substantial increases (5 - 10x) in high- beam-quality power levels when operating with unstable resonators. This has enabled us to achieve much higher powers in second-harmonic generation from the visible copper laser output to the ultraviolet (e.g. 5 W at 255 nm from a small- scale KE-CVL). Our approach to developing KE-CVLs including computer modeling and experimental studies will be reviewed, and most recent results in pulse rate scaling and scaling of high-beam-quality power using oscillator-amplifier configurations, will be presented.

  9. Direct spectral analysis and determination of high content of carcinogenic bromine in bread using UV pulsed laser induced breakdown spectroscopy.

    Science.gov (United States)

    Mehder, A O; Gondal, Mohammed A; Dastageer, Mohamed A; Habibullah, Yusuf B; Iqbal, Mohammed A; Oloore, Luqman E; Gondal, Bilal

    2016-01-01

    Laser induced breakdown spectroscopy (LIBS) was applied for the detection of carcinogenic elements like bromine in four representative brands of loaf bread samples and the measured bromine concentrations were 352, 157, 451, and 311 ppm, using Br I (827.2 nm) atomic transition line as the finger print atomic transition. Our LIBS system is equipped with a pulsed laser of wavelength 266 nm with energy 25 mJ pulse(-1), 8 ns pulse duration, 20 Hz repetition rate, and a gated ICCD camera. The LIBS system was calibrated with the standards of known concentrations in the sample (bread) matrix and such plot is linear in 20-500 ppm range. The capability of our system in terms of limit of detection and relative accuracy with respect to the standard inductively coupled plasma mass spectrometry (ICPMS) technique was evaluated and these values were 5.09 ppm and 0.01-0.05, respectively, which ensures the applicability of our system for Br trace level detection, and LIBS results are in excellent agreement with that of ICPMS results.

  10. Ablation de ZnO par laser UV (193 nm) : nano-agrégats en phase gazeuse

    Science.gov (United States)

    Ozerov, I.; Bulgakov, A.; Nelson, D.; Castell, R.; Sentis, M.; Marine, W.

    2003-06-01

    La condensation de nano-agrégats d'oxyde de zinc en phase gazeuse est mise en évidence lors de l'ablation de ZnO massif par laser ArF pulsé. Nous comparons l'évolution spatio-temporelle de la forme du panache d'ablation (plume) de ZnO sous vide et sous atmosphère de gaz de couverture (oxygène et/ou hélium) à partir des images CCD et des résultats issus d'analyses spectroscopiques. L'expansion du plasma et la croissance des nano-clusters sont influencées par l'effet du confinement de la plume dû aux collisions entre les particules ablatées et les molécules de gaz ambiant ainsi que par les réactions chimiques dans le cas de l'oxygène. Le spectre de rayonnement du plasma est constitué principalement par l'émission d'atomes excités de Zn neutre. Nous avons observé la photoluminescence des nano-agrégats en suspension dans le gaz ainsi que leur décomposition par laser ArF.

  11. 3D nanostructured inkjet printed graphene via UV-pulsed laser irradiation enables paper-based electronics and electrochemical devices.

    Science.gov (United States)

    Das, Suprem R; Nian, Qiong; Cargill, Allison A; Hondred, John A; Ding, Shaowei; Saei, Mojib; Cheng, Gary J; Claussen, Jonathan C

    2016-09-21

    Emerging research on printed and flexible graphene-based electronics is beginning to show tremendous promise for a wide variety of fields including wearable sensors and thin film transistors. However, post-print annealing/reduction processes that are necessary to increase the electrical conductivity of the printed graphene degrade sensitive substrates (e.g., paper) and are whole substrate processes that are unable to selectively anneal/reduce only the printed graphene-leaving sensitive device components exposed to damaging heat or chemicals. Herein a pulsed laser process is introduced that can selectively irradiate inkjet printed reduced graphene oxide (RGO) and subsequently improve the electrical conductivity (Rsheet∼0.7 kΩ□(-1)) of printed graphene above previously published reports. Furthermore, the laser process is capable of developing 3D petal-like graphene nanostructures from 2D planar printed graphene. These visible morphological changes display favorable electrochemical sensing characteristics-ferricyanide cyclic voltammetry with a redox peak separation (ΔEp) ≈ 0.7 V as well as hydrogen peroxide (H2O2) amperometry with a sensitivity of 3.32 μA mM(-1) and a response time of <5 s. Thus this work paves the way for not only paper-based electronics with graphene circuits, it enables the creation of low-cost and disposable graphene-based electrochemical electrodes for myriad applications including sensors, biosensors, fuel cells, and theranostic devices.

  12. Digital selective growth of a ZnO nanowire array by large scale laser decomposition of zinc acetate

    Science.gov (United States)

    Hong, Sukjoon; Yeo, Junyeob; Manorotkul, Wanit; Kang, Hyun Wook; Lee, Jinhwan; Han, Seungyong; Rho, Yoonsoo; Suh, Young Duk; Sung, Hyung Jin; Ko, Seung Hwan

    2013-04-01

    We develop a digital direct writing method for ZnO NW micro-patterned growth on a large scale by selective laser decomposition of zinc acetate. For ZnO NW growth, by replacing the bulk heating with the scanning focused laser as a fully digital local heat source, zinc acetate crystallites can be selectively activated as a ZnO seed pattern to grow ZnO nanowires locally on a larger area. Together with the selective laser sintering process of metal nanoparticles, more than 10 000 UV sensors have been demonstrated on a 4 cm × 4 cm glass substrate to develop all-solution processible, all-laser mask-less digital fabrication of electronic devices including active layer and metal electrodes without any conventional vacuum deposition, photolithographic process, premade mask, high temperature and vacuum environment.We develop a digital direct writing method for ZnO NW micro-patterned growth on a large scale by selective laser decomposition of zinc acetate. For ZnO NW growth, by replacing the bulk heating with the scanning focused laser as a fully digital local heat source, zinc acetate crystallites can be selectively activated as a ZnO seed pattern to grow ZnO nanowires locally on a larger area. Together with the selective laser sintering process of metal nanoparticles, more than 10 000 UV sensors have been demonstrated on a 4 cm × 4 cm glass substrate to develop all-solution processible, all-laser mask-less digital fabrication of electronic devices including active layer and metal electrodes without any conventional vacuum deposition, photolithographic process, premade mask, high temperature and vacuum environment. Electronic supplementary information available. See DOI: 10.1039/c3nr34346d

  13. Migration from full-head mask to "open-face" mask for immobilization of patients with head and neck cancer.

    Science.gov (United States)

    Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-09-06

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to

  14. Investigation of material property influenced stoichiometric deviations as evidenced during UV laser-assisted atom probe tomography in fluorite oxides

    Energy Technology Data Exchange (ETDEWEB)

    Valderrama, Billy; Henderson, Hunter B. [Department of Materials Science and Engineering, University of Florida, 100 Rhines Hall, Gainesville, FL 32611 (United States); Yablinsky, Clarissa A. [Department of Nuclear Engineering, University of Wisconsin-Madison, 921 ERB, 1500 Engineering Drive, Madison, WI 53706 (United States); Gan, Jian [Idaho National Laboratory, P.O. Box 1625, Idaho Falls, ID 83415 (United States); Allen, Todd R. [Department of Nuclear Engineering, University of Wisconsin-Madison, 921 ERB, 1500 Engineering Drive, Madison, WI 53706 (United States); Idaho National Laboratory, P.O. Box 1625, Idaho Falls, ID 83415 (United States); Manuel, Michele V., E-mail: mmanuel@mse.ufl.edu [Department of Materials Science and Engineering, University of Florida, 100 Rhines Hall, Gainesville, FL 32611 (United States)

    2015-09-15

    Oxide materials are used in numerous applications such as thermal barrier coatings, nuclear fuels, and electrical conductors and sensors, all applications where nanometer-scale stoichiometric changes can affect functional properties. Atom probe tomography can be used to characterize the precise chemical distribution of individual species and spatially quantify the oxygen to metal ratio at the nanometer scale. However, atom probe analysis of oxides can be accompanied by measurement artifacts caused by laser-material interactions. In this investigation, two technologically relevant oxide materials with the same crystal structure and an anion to cation ratio of 2.00, pure cerium oxide (CeO{sub 2}) and uranium oxide (UO{sub 2}) are studied. It was determined that electronic structure, optical properties, heat transfer properties, and oxide stability strongly affect their evaporation behavior, thus altering their measured stoichiometry, with thermal conductance and thermodynamic stability being strong factors.

  15. Deciphering the Paleoproterozoic cooling history of the northeastern Trans-Hudson Orogen, Baffin Island (Canada), using 40Ar/39Ar step-heating and UV laser thermochronology

    Science.gov (United States)

    Skipton, D. R.; Schneider, D. A.; Kellett, D. A.; Joyce, N. L.

    2017-07-01

    The previously unstudied cooling and exhumation history of mid-crustal rocks exposed on southeastern Baffin Island (Canada) provides new insights into the post-orogenic evolution of the Paleoproterozoic Trans-Hudson Orogen (THO). New 40Ar/39Ar step-heat analyses of biotite, muscovite and phlogopite and core-to-rim intra-grain 40Ar/39Ar analyses of muscovite have a range of apparent ages compatible with slow regional cooling following peak metamorphism. Twenty-nine amphibolite- to granulite-facies rocks were dated using the 40Ar/39Ar step-heating laser (CO2) method. 40Ar/39Ar spot analyses were performed across muscovite grains from three samples using an ultraviolet (UV) laser to investigate intra-grain 40Ar/39Ar age variations. Step-heating apparent ages range from ca. 1788-1622 Ma for biotite, 1720-1630 Ma for phlogopite and 1729-1657 Ma for muscovite. UV spot 40Ar/39Ar analyses in the three muscovite grains range from ca. 1661-1640 Ma, 1675-1645 Ma and 1680-1652 Ma, with core-to-rim apparent age gradients of 20-30 Myr. Previous studies resolved peak metamorphism in this region to between ca. 1860 and 1820 Ma and identified late- to post-THO zircon and monazite populations at ca. 1800-1750 Ma. Numerical diffusion models for Ar in muscovite were conducted to test different Proterozoic cooling and exhumation scenarios. Comparisons with our 40Ar/39Ar ages attest to cooling rates of 1-2 °C/Myr following peak metamorphism and 1.5-2.5 °C/Myr after ca. 1740 Ma. Anomalously old apparent 40Ar/39Ar ages, in cases equivalent to U-Pb zircon rim and monazite ages, likely result from incorporation of excess Ar. The results suggest that mid-crustal rocks on southeastern Baffin Island remained hotter than 420-450 °C for 150-200 Myr after peak metamorphism, with subsequent slow cooling and denudation rates that are typical of Proterozoic orogens. The apparent absence of orogenic collapse implies that, despite high temperatures and estimated maximum crustal thicknesses

  16. Mask industry quality assessment

    Science.gov (United States)

    Strott, Al; Bassist, Larry

    1994-12-01

    Product quality and timely delivery are two of the most important parameters in determining the success of a mask manufacturing facility. Because of the sensitivity of this data, very little was known about industry performance in these areas until an assessment was authored and presented at the 1993 BACUS Symposium by Larry Regis of Intel Corporation, Neil Paulsen of Intel Corporation, and James A. Reynolds of Reynolds Consulting. This data has been updated and will be published and presented at this year's BACUS Symposium. Contributor identities will again remain protected by utilizing Arthur Andersen & Company to compile the submittals. Participation was consistent with last year's representation of over 75% of the total merchant and captive mask volume in the United States. The data compiled includes shipments, customer return rate, customer return reasons from 1988 through Q2, 1994, performance to schedule, plate survival yield, and throughput time (TPT).

  17. Masked multichannel analyzer

    Science.gov (United States)

    Winiecki, A.L.; Kroop, D.C.; McGee, M.K.; Lenkszus, F.R.

    1984-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  18. Latest results on solarization of optical glasses with pulsed laser radiation

    Science.gov (United States)

    Jedamzik, Ralf; Petzold, Uwe

    2017-02-01

    Femtosecond lasers are more and more used for material processing and lithography. Femtosecond laser help to generate three dimensional structures in photoresists without using masks in micro lithography. This technology is of growing importance for the field of backend lithography or advanced packaging. Optical glasses used for beam shaping and inspection tools need to withstand high laser pulse energies. Femtosecond laser radiation in the near UV wavelength range generates solarization effects in optical glasses. In this paper results are shown of femtosecond laser solarization experiments on a broad range of optical glasses from SCHOTT. The measurements have been performed by the Laser Zentrum Hannover in Germany. The results and their impact are discussed in comparison to traditional HOK-4 and UVA-B solarization measurements of the same materials. The target is to provide material selection guidance to the optical designer of beam shaping lens systems.

  19. Direct Creation of Biopatterns via a Combination of Laser-Based Techniques and Click Chemistry.

    Science.gov (United States)

    Chatzipetrou, Marianneza; Massaouti, Maria; Tsekenis, George; Trilling, Anke K; van Andel, Esther; Scheres, Luc; Smulders, Maarten M J; Zuilhof, Han; Zergioti, Ioanna

    2017-01-31

    In this paper, we present the immobilization of thiol-modified aptamers on alkyne- or alkene-terminated silicon nitride surfaces by laser-induced click chemistry reactions. The aptamers are printed onto the surface by laser-induced forward transfer (LIFT), which also induces the covalent bonding of the aptamers by thiol-ene or thiol-yne reactions that occur upon UV irradiation of the thiol-modified aptamers with ns laser pulses. This combination of LIFT and laser-induced click chemistry allows the creation of high-resolution patterns without the need for masks. Whereas the click chemistry already takes place during the printing process (single-step process) by the laser pulse used for the printing process, further irradiation of the LIFT-printed aptamers by laser pulses (two-step process) leads to a further increase in the immobilization efficiency.

  20. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  1. Direct spectral analysis of tea samples using 266 nm UV pulsed laser-induced breakdown spectroscopy and cross validation of LIBS results with ICP-MS.

    Science.gov (United States)

    Gondal, M A; Habibullah, Y B; Baig, Umair; Oloore, L E

    2016-05-15

    Tea is one of the most common and popular beverages spanning vast array of cultures all over the world. The main nutritional benefits of drinking tea are its anti-oxidant properties, presumed protection against certain cancers, inhibition of inflammation and possible protective effects against diabetes. Laser induced breakdown spectrometer (LIBS) was assembled as a powerful tool for qualitative and quantitative analysis of various brands of tea samples using 266 nm pulsed UV laser. LIBS spectra for six brands of tea samples in the wavelength range of 200-900 nm was recorded and all elements present in our tea samples were identified. The major toxic elements detected in several brands of tea samples were bromine, chromium and minerals like iron, calcium, potassium and silicon. The spectral assignment was conducted prior to the determination of concentration of each element. For quantitative analysis, calibration curves were drawn for each element using standard samples prepared in known concentration in the tea matrix. The plasma parameters (electron temperature and electron density) were also determined prior to the tea samples spectroscopic analysis. The concentration of iron, chromium, potassium, bromine, copper, silicon and calcium detected in all tea samples was between 378-656, 96-124, 1421-6785, 99-1476, 17-36, 2-11 and 92-130 mg L(-1) respectively. The limits of detection estimated for Fe, Cr, K, Br, Cu, Si, Ca in tea samples were 22, 12, 14, 11, 6, 1 and 12 mg L(-1) respectively. To further confirm the accuracy of our LIBS results, we determined the concentration of each element present in tea samples by using standard analytical technique like ICP-MS. The concentrations detected with our LIBS system are in excellent agreement with ICP-MS results. The system assembled for spectral analysis in this work could be highly applicable for testing the quality and purity of food and also pharmaceuticals products. Copyright © 2016 Elsevier B.V. All rights reserved.

  2. Fractionation of a coal tar pitch by ultra-filtration, and characterization by size exclusion chromatography, UV-fluorescence and laser desorption-mass spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Anthe George; Trevor J. Morgan; Patricia Alvarez; Marcos Millan; Alan A. Herod; Rafael Kandiyoti [Imperial College London, London (United Kingdom). Department of Chemical Engineering

    2010-10-15

    Ultra-filtration (UF) provides a new way of generating narrow bands of sample in the fractionation of coal and petroleum-derived liquids. It allows larger quantities of high-mass fractions to be recovered, making more detailed investigations possible, through the use of techniques requiring larger amounts of sample. In this work, UF-separated fractions have been used to study molecular mass distributions of a coal tar pitch, used as laboratory standard. The pitch was fractionated by solvent solubility into three fractions. These were further fractionated by ultra-filtration, using membranes specific to protein molecular sizes classed as '1 kDa', '5 kDa', '10 kDa' and '100 kDa'. Planar chromatography was used as a tertiary fractionation method, to sub-divide the UF-fractions. The various fractions were examined by size exclusion chromatography (SEC), UV-fluorescence spectroscopy and laser desorption-mass spectrometry (LD-MS). There was good agreement between mass estimates based on SEC and LD-MS of the smaller UF-fractions, with evidence for the presence of material with molecular masses ranging between 800 and 10,000 u. Examining the largest UF fractions of the pitch-pyridine-insoluble sample also gave clear evidence for material with molecular masses above 10,000 u. Taken together, however, the LD-MS data showed progressively diminishing differences, as the sizes of the UF membranes, and the likely molecular masses of the sample fractions, increased. One likely explanation is incomplete sampling during the laser desorption procedure. The evidence suggests that the upper mass limit detectable for these and similar samples by LD-MS has been reached. Despite these reservations, LD-MS appears as the best method to date, for investigating the mass ranges of samples derived from coal tar pitch and heavy petroleum fractions. 51 refs., 6 figs., 3 tabs.

  3. BIRD FLU MASKS

    Directory of Open Access Journals (Sweden)

    YASAR KESKIN

    2006-08-01

    Full Text Available Avian influenza (bird flu is a disease of birds caused by influenza viruses closely related to human influenza viruses. The potential for transformation of avian influenza into a form that both causes severe disease in humans and spreads easily from person to person is a great concern for world health. The main purpose of a mask is to help prevent particles (droplets being expelled into the environment by the wearer. Masks are also resistant to fluids, and help protect the wearer from splashes of blood or other potentially infectious substances. They are not necessarily designed for filtration efficiency, or to seal tightly to the face. Masks and respirators are components of a number of infection control measures intended to protect healthcare workers, and prevent the spread of diseases. All healthcare workers who come into contact with a possible or probable case of any respiratory track infections should wear a respirator conforming to at least EN149:2001 FFP3. [TAF Prev Med Bull 2006; 5(4.000: 296-306

  4. Methods and results for calibration and track separation of a GEM based TPC using an UV-laser

    Energy Technology Data Exchange (ETDEWEB)

    Ball, Markus

    2008-12-15

    In the last 30 years high energy physics could write an impressive story of success. Since the introduction of the Standard Model (SM), it has met every experimental test. However the final confirmation has to prove the mechanism of electroweak symmetry breaking, which could not be confirmed yet. The most favored theory, which includes the introduction of a Higgs field, could not be verified experimentally. Furthermore there is clear evidence, that the SM is only a low energy description of nature and its principles, as the SM describes only 4 % of the known matter in the universe. There are two different approaches in accelerator driven high energy physics to clarify the open questions. The Large Hadron Collider (LHC) have a good opportunity to measure some of the missing pieces with its high center of mass energy. The International Linear Collider (ILC) will then measure their parameters with high precision. To guarantee this high precision the detectors have to be able to identify every single particle and determine its properties with high accuracy. These high requirements to the single detectors as well as the interconnectivity between all detectors are summarised by the concept of particle flow (PFLOW). This means that all particles must be separable, which includes in particular the main tracking device. A possible candidate for the central tracking device is a Time Projection Chamber (TPC). In this work a TPC with Gas Electron Multipliers (GEM) as gas amplification system was used. The GEMs replace the conventional wire amplification system of the TPC. In this PhD work a method to determine the drift velocity of a TPC was developed and tested using an ultraviolet laser. To ensure a high accuracy of the method all relevant gas parameters were measured with a slow control system. Furthermore the laser was used to investigate the separation capability of nearby tracks. Therefore an existing TPC prototype, which was developed to operate in a 5 T magnet facility

  5. Influence of organic solvent on optical and structural properties of ultra-small silicon dots synthesized by UV laser ablation in liquid.

    Science.gov (United States)

    Intartaglia, Romuald; Bagga, Komal; Genovese, Alessandro; Athanassiou, Athanassia; Cingolani, Roberto; Diaspro, Alberto; Brandi, Fernando

    2012-11-28

    Ultra small silicon nanoparticles (Si-NPs) with narrow size distribution are prepared in a one step process by UV picosecond laser ablation of silicon bulk in liquid. Characterization by electron microscopy and absorption spectroscopy proves Si-NPs generation with an average size of 2 nm resulting from an in situ photofragmentation effect. In this context, the current work aims to explore the liquid medium (water and toluene) effect on the Si-NPs structure and on the optical properties of the colloidal solution. Si-NPs with high pressure structure (s.g. Fm3m) and diamond-like structure (s.g. Fd3m), in water, and SiC moissanite 3C phase (s.g. F4[combining macron]3m) in toluene are revealed by the means of High-Resolution TEM and HAADF-STEM measurements. Optical investigations show that water-synthesized Si-NPs have blue-green photoluminescence emission characterized by signal modulation at a frequency of 673 cm(-1) related to electron-phonon coupling. The synthesis in toluene leads to generation of Si-NPs embedded in the graphitic carbon-polymer composite which has intrinsic optical properties at the origin of the optical absorption and luminescence of the obtained colloidal solution.

  6. Lithographic performance of a new "low-k" mask

    Science.gov (United States)

    Adachi, Takashi; Tani, Ayako; Fujimura, Yukihiro; Hayano, Katsuya; Morikawa, Yasutaka; Miyashita, Hiroyuki; Inazuki, Yukio; Kawai, Yoshio

    2016-05-01

    We have been researching new mask blank materials for the next generation lithography (NGL) and developed a new mask blank with low-k phase shifter [1] [2]. The low-k phase shifter consists of only Si and N. In our previous work, we reported the advantages of developed SiN phase shift mask (PSM) [2]. It showed high lithographic performance and high durability against ArF excimer laser as well as against cleaning. In this report, we further verified its high lithographic performance on several types of device pattern. The SiN PSM had high lithographic performance compared with conventional 6% MoSi PSM. Exposure latitude (EL) and mask enhancement factor (MEEF) were especially improved on originally designed Gate, Metal and Via patterns.

  7. Mask alignment system for semiconductor processing

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.; Grant, Christopher N.

    2017-02-14

    A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

  8. Matching profiles of masked perpetrators: a pilot study

    DEFF Research Database (Denmark)

    Lynnerup, Niels; Bojesen, Sophie; Kuhlman, Michael Bilde

    2010-01-01

    indicate the possible matches, and perhaps even the best match, which may be helpful in police investigations, but it would not carry enough weight to be used as evidence per se. This study only focused on the profile. Future studies will use surface laser scans to analyse congruence between masked...

  9. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    DEFF Research Database (Denmark)

    Kehagias, N.; Reboud, V.; Chansin, G.

    2007-01-01

    are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed...

  10. Trends in mask data preparation

    Science.gov (United States)

    Fujimura, Aki; Pang, Liyong; Su, Bo; Choi, Yohan

    2014-10-01

    Whether for VSB mask writing or for multibeam mask writing, the shapes we need to write on masks are increasingly complex, increasingly curvilinear, and smaller in minimum width and space. The overwhelming trend in mask data preparation (MDP) is the shift from deterministic, rule-based, geometric, context-independent, shape-modulated, rectangular processing to statistical, simulation-based, context-dependent, dose- and shape-modulated any-shape processing. The paper briefly surveys the history of MDP, and explains through a simulation-based study that 50nm line and space is the tipping point where rule-based processing gives away to simulation-based processing.

  11. Masked hypertension: a systematic review.

    Science.gov (United States)

    Bobrie, Guillaume; Clerson, Pierre; Ménard, Joël; Postel-Vinay, Nicolas; Chatellier, Gilles; Plouin, Pierre-François

    2008-09-01

    The purpose of this research was to review the literature on masked hypertension. Studies, reviews and editorials on masked hypertension were identified by PubMed, Pascal BioMed and Cochrane literature systematic searches. Then, we carried out a meta-analysis of the six cohort studies reporting quantitative data for masked hypertension prognosis. There is still no clear consensus definition of masked hypertension and the reproducibility of the phenomenon is unknown. Nevertheless, the prevalence of masked hypertension seems to lie between 8 and 20%, and can be up to 50% in treated hypertensive patients. Subjects with masked hypertension have a higher risk of cardiovascular accidents [hazard ratios: 1.92 (1.51-2.44)] than normotensive subjects. This is due to a possible failure to recognize and appropriately manage this particular form of hypertension, the frequent association with other risk factors and coexisting target organ damage. The remaining unresolved questions are as follows: is masked hypertension a clinical entity that requires identification and characterization or a statistical phenomenon linked to the variability of blood pressure measurements?; because screening of the entire population is not feasible, how to identify individuals with masked hypertension?; and, in the absence of randomized trial, how to treat masked hypertension?

  12. What Is Being Masked in Object Substitution Masking?

    Science.gov (United States)

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  13. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  14. Coherent diffractive imaging using randomly coded masks

    Energy Technology Data Exchange (ETDEWEB)

    Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); D' Aspremont, Alexandre [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Turner, Joshua J. [Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

    2015-12-07

    We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments.

  15. Masked Repetition Priming Using Magnetoencephalography

    Science.gov (United States)

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  16. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...... Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (P...

  17. Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

    Science.gov (United States)

    Matsuoka, Yoichi; Seki, Junichi; Nakayama, Takahiro; Nakagawa, Kazuki; Azuma, Hisanobu; Yamamoto, Kiyohito; Sato, Chiaki; Sakai, Fumio; Takabayashi, Yukio; Aghili, Ali; Mizuno, Makoto; Choi, Jin; Jones, Chris E.

    2016-10-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

  18. Polycarbazoles microcavities: towards plastic blue lasers

    Energy Technology Data Exchange (ETDEWEB)

    Castex, M.C.; Olivero, C.; Fischer, A.; Mousel, S.; Michelon, J.; Ades, D.; Siove, A

    2002-09-30

    With the aim of developing a plastic blue laser emitting around 400 nm, we have investigated the luminescence and lasing possibilities of recently designed new polymeric materials based on carbazole chromophores. Our carbazole compounds are used either as doping organic dyes in usual polymer cast films (e.g. PMMA) or as thin layers deposited onto a quartz substrate. In both cases, by using different interferometric methods, periodic patterning of surfaces has been realised and compared. Efficient relief gratings are produced by laser irradiation at 193 nm of a phase mask ({lambda}=1090 nm) in con onto carbazolic films. We demonstrate that such patterning allows photopumping of doped PMMA films in a planar waveguide configuration with distributed feedback (DFB) even for high Bragg grating order (m=6). Monomode stimulated emission is observed for rhodamine doped PMMA film. Preliminary results concerning UV photopumping of carbazolic films are presented.

  19. Polycarbazoles microcavities: towards plastic blue lasers

    Science.gov (United States)

    Castex, M. C.; Olivero, C.; Fischer, A.; Mousel, S.; Michelon, J.; Adès, D.; Siove, A.

    2002-09-01

    With the aim of developing a plastic blue laser emitting around 400 nm, we have investigated the luminescence and lasing possibilities of recently designed new polymeric materials based on carbazole chromophores. Our carbazole compounds are used either as doping organic dyes in usual polymer cast films (e.g. PMMA) or as thin layers deposited onto a quartz substrate. In both cases, by using different interferometric methods, periodic patterning of surfaces has been realised and compared. Efficient relief gratings are produced by laser irradiation at 193 nm of a phase mask ( Λ=1090 nm) in contact onto carbazolic films. We demonstrate that such patterning allows photopumping of doped PMMA films in a planar waveguide configuration with distributed feedback (DFB) even for high Bragg grating order ( m=6). Monomode stimulated emission is observed for rhodamine doped PMMA film. Preliminary results concerning UV photopumping of carbazolic films are presented.

  20. UV Microstereolithography System that uses Spatial Light Modulator Technology.

    Science.gov (United States)

    Chatwin, C; Farsari, M; Huang, S; Heywood, M; Birch, P; Young, R; Richardson, J

    1998-11-10

    A new stereophotolithography technique utilizing a spatial light modulator (SLM) to create three-dimensional components with a planar, layer-by-layer process of exposure is described. With this procedure it is possible to build components with dimensions in the range of 50 mum-50 mm and feature sizes as small as 5 mum with a resolution of 1 mum. A polysilicon thin-film twisted nematic SVGA SLM is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. Each of these system components is briefly described. In addition, the optical characteristics of commercially available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins. These experiments were carried out to prove the suitability of these photopolymerization systems for microstereolithography.

  1. Biological Activity of Masked Endotoxin

    Science.gov (United States)

    Schwarz, Harald; Gornicec, Jan; Neuper, Theresa; Parigiani, Maria Alejandra; Wallner, Michael; Duschl, Albert; Horejs-Hoeck, Jutta

    2017-01-01

    Low endotoxin recovery (LER) is a recently discovered phenomenon describing the inability of limulus amebocyte lysate (LAL)-based assays to detect lipopolysaccharide (LPS) because of a “masking effect” caused by chelators or detergents commonly used in buffer formulations for medical products and recombinant proteins. This study investigates the masking capacities of different buffer formulations and whether masked endotoxin is biologically active. We show that both naturally occurring endotoxin as well as control standard endotoxin can be affected by LER. Furthermore, whereas masked endotoxin cannot be detected in Factor C based assays, it is still detectable in a cell-based TLR4-NF-κB-luciferase reporter gene assay. Moreover, in primary human monocytes, masked LPS induces the expression of pro-inflammatory cytokines and surface activation markers even at very low concentrations. We therefore conclude that masked LPS is a potent trigger of immune responses, which emphasizes the potential danger of masked LPS, as it may pose a health threat in pharmaceutical products or compromise experimental results. PMID:28317862

  2. Production of extended plasma channels in atmospheric air by amplitude-modulated UV radiation of GARPUN-MTW Ti : sapphire—KrF laser. Part 2. Accumulation of plasma electrons and electric discharge control

    Science.gov (United States)

    Zvorykin, V. D.; Ionin, Andrei A.; Levchenko, A. O.; Mesyats, Gennadii A.; Seleznev, L. V.; Sinitsyn, D. V.; Smetanin, Igor V.; Sunchugasheva, E. S.; Ustinovskii, N. N.; Shutov, A. V.

    2013-04-01

    The problem of the production of extended (~1 m) plasma channels is studied in atmospheric air by amplitude-modulated laser pulses of UV radiation, which are a superposition of a subpicosecond USP train amplified in a regenerative KrF amplifier with an unstable confocal resonator and a quasi-stationary lasing pulse. The USPs possess a high (0.2-0.3 TW) peak power and efficiently ionise oxygen molecules due to multiphoton ionisation, and the quasi-stationary lasing pulse, which has a relatively long duration (~100 ns), maintains the electron density at a level ne = (3-5) × 1014 cm—3 by suppressing electron attachment to oxygen. Experiments in laser triggering of high-voltage electric discharges suggest that the use of combined pulses results in a significant lowering of the breakdown threshold and enables controlling the discharge trajectory with a higher efficiency in comparison with smooth pulses. It was shown that controlled breakdowns may develop with a delay of tens of microseconds relative to the laser pulse, which is many orders of magnitude greater than the lifetime of free electrons in the laser-induced plasma. We propose a mechanism for this breakdown, which involves speeding-up of the avalanche ionisation of the air by negative molecular oxygen ions with a low electron binding energy (~0.5 eV) and a long lifetime (~1 ms), which are produced upon cessation of the laser pulse.

  3. Thiol-thione tautomeric analysis, spectroscopic (FT-IR, Laser-Raman, NMR and UV-vis) properties and DFT computations of 5-(3-pyridyl)-4H-1,2,4-triazole-3-thiol molecule.

    Science.gov (United States)

    Gökce, Halil; Öztürk, Nuri; Ceylan, Ümit; Alpaslan, Yelda Bingöl; Alpaslan, Gökhan

    2016-06-15

    In this study, the 5-(3-pyridyl)-4H-1,2,4-triazole-3-thiol molecule (C7H6N4S) molecule has been characterized by using FT-IR, Laser-Raman, NMR and UV-vis spectroscopies. Quantum chemical calculations have been performed to investigate the molecular structure (thione-thiol tautomerism), vibrational wavenumbers, electronic transition absorption wavelengths in DMSO solvent and vacuum, proton and carbon-13 NMR chemical shifts and HOMOs-LUMOs energies at DFT/B3LYP/6-311++G(d,p) level for all five tautomers of the title molecule. The obtained results show that the calculated vibrational wavenumbers, NMR chemical shifts and UV-vis wavelengths are in a good agreement with experimental data. Copyright © 2016 Elsevier B.V. All rights reserved.

  4. Thiol-thione tautomeric analysis, spectroscopic (FT-IR, Laser-Raman, NMR and UV-vis) properties and DFT computations of 5-(3-pyridyl)-4H-1,2,4-triazole-3-thiol molecule

    Science.gov (United States)

    Gökce, Halil; Öztürk, Nuri; Ceylan, Ümit; Alpaslan, Yelda Bingöl; Alpaslan, Gökhan

    2016-06-01

    In this study, the 5-(3-pyridyl)-4H-1,2,4-triazole-3-thiol molecule (C7H6N4S) molecule has been characterized by using FT-IR, Laser-Raman, NMR and UV-vis spectroscopies. Quantum chemical calculations have been performed to investigate the molecular structure (thione-thiol tautomerism), vibrational wavenumbers, electronic transition absorption wavelengths in DMSO solvent and vacuum, proton and carbon-13 NMR chemical shifts and HOMOs-LUMOs energies at DFT/B3LYP/6-311 ++G(d,p) level for all five tautomers of the title molecule. The obtained results show that the calculated vibrational wavenumbers, NMR chemical shifts and UV-vis wavelengths are in a good agreement with experimental data.

  5. Laser profiling of 3D microturbine blades

    Science.gov (United States)

    Holmes, Andrew S.; Heaton, Mark E.; Hong, Guodong; Pullen, Keith R.; Rumsby, Phil T.

    2003-11-01

    We have used KrF excimer laser ablation in the fabrication of a novel MEMS power conversion device based on an axial-flow turbine with an integral axial-flux electromagnetic generator. The device has a sandwich structure, comprising a pair of silicon stators either side of an SU8 polymer rotor. The curved turbine rotor blades were fabricated by projection ablation of SU8 parts performed by conventional UV lithography. A variable aperture mask, implemented by stepping a moving aperture in front of a fixed one, was used to achieve the desired spatial variation in the ablated depth. An automatic process was set up on a commercial laser workstation, with the laser firing and mask motion being controlled by computer. High quality SU8 rotor parts with diameters of 13 mm and depths of 1 mm were produced at a fluence of 0.7 J/cm2, corresponding to a material removal rate of approximately 0.3 μm per pulse. A similar approach was used to form SU8 guide vane inserts for the stators.

  6. Hg-Mask Coronagraph

    Science.gov (United States)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  7. Mechanical alignment of substrates to a mask

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Honan, Michael; Amato, Luigi G.; Grant, Christopher Neil; Strassner, James D.

    2016-11-08

    A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

  8. Vibrotactile masking through the body.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-09-01

    Touches on one hand or forearm can affect tactile sensitivity at contralateral locations on the opposite side of the body. These interactions suggest an intimate connection between the two sides of the body. Here, we explore the effect of masking not across the body but through the body by measuring the effect of a masking stimulus on the back on the tactile sensitivity of the corresponding point on the front. Tactile sensitivity was measured on each side of the stomach, while vibrotactile masking stimulation was applied to one side of the front and to points on the back including the point directly behind the test point on the front. Results were compared to sensitivity, while vibrotactile stimulation was applied to a control site on the shoulder. A reduction in sensitivity of about .8 dB was found that required the masking stimulus to be within about 2 cm of the corresponding point on the back.

  9. Mask specification guidelines in spacer patterning technology

    Science.gov (United States)

    Hashimoto, Kohji; Mukai, Hidefumi; Miyoshi, Seiro; Yamaguchi, Shinji; Mashita, Hiromitsu; Kobayashi, Yuuji; Kawano, Kenji; Hirano, Takashi

    2008-11-01

    We have studied both the mask CD specification and the mask defect specification for spacer patterning technology (SPT). SPT has the possibility of extending optical lithography to below 40nm half-pitch devices. Since SPT necessitates somewhat more complicated wafer process flow, the CD error and mask defect printability on wafers involve more process factors compared with conventional single-exposure process (SEP). This feature of SPT implies that it is very important to determine mask-related specifications for SPT in order to select high-end mask fabrication strategies; those are for mask writing tools, mask process development, materials, inspection tools, and so on. Our experimental studies reveal that both mask CD specification and mask defect specification are somehow relaxed from those in ITRS2007. This is most likely because SPT reduces mask CD error enhanced factor (MEF) and the reduction of line-width roughness (LWR).

  10. Matrix-free UV-laser desorption/ionization (LDI) mass spectrometric imaging at the single-cell level: distribution of secondary metabolites of Arabidopsis thaliana and Hypericum species.

    Science.gov (United States)

    Hölscher, Dirk; Shroff, Rohit; Knop, Katrin; Gottschaldt, Michael; Crecelius, Anna; Schneider, Bernd; Heckel, David G; Schubert, Ulrich S; Svatos, Ales

    2009-12-01

    The present paper describes matrix-free laser desorption/ionisation mass spectrometric imaging (LDI-MSI) of highly localized UV-absorbing secondary metabolites in plant tissues at single-cell resolution. The scope and limitations of the method are discussed with regard to plants of the genus Hypericum. Naphthodianthrones such as hypericin and pseudohypericin are traceable in dark glands on Hypericum leaves, placenta, stamens and styli; biflavonoids are also traceable in the pollen of this important phytomedical plant. The highest spatial resolution achieved, 10 microm, was much higher than that achieved by commonly used matrix-assisted laser desorption/ionization (MALDI) imaging protocols. The data from imaging experiments were supported by independent LDI-TOF/MS analysis of cryo-sectioned, laser-microdissected and freshly cut plant material. The results confirmed the suitability of combining laser microdissection (LMD) and LDI-TOF/MS or LDI-MSI to analyse localized plant secondary metabolites. Furthermore, Arabidopsis thaliana was analysed to demonstrate the feasibility of LDI-MSI for other commonly occurring compounds such as flavonoids. The organ-specific distribution of kaempferol, quercetin and isorhamnetin, and their glycosides, was imaged at the cellular level.

  11. 纳秒紫外重复脉冲激光烧蚀单晶硅的热力学过程研究%Investigation of thermodynamic progress of silicon ablated by nanosecond uv repetitive pulse laser

    Institute of Scientific and Technical Information of China (English)

    包凌东; 韩敬华; 段涛; 孙年春; 高翔; 冯国英; 杨李茗; 牛瑞华; 刘全喜

    2012-01-01

    采用波长为355nm的纳秒紫外重复脉冲激光对单晶硅片进行了盲孔加工实验,观测了随脉冲增加激光烧蚀硅片的外观形貌和盲孔孔深、孔径的变化规律,并对紫外激光辐照硅片的热力学过程进行了分析.研究结果表明:紫外激光加工硅盲孔是基于热、力效应共同作用的结果,热效应会使得硅材料熔化、气化甚至发生电离产生激光等离子体,为材料的去除提供条件;激光等离子体冲击波以及高温气态物向外膨胀会对熔化材料产生压力致使其向外喷射,为重复脉冲的进一步烧蚀提供了条件;力效应主要沿着激光传输的方向,垂直于硅表面,使得去除部位主要集中在孔的深度方向,达到较高的孔径比,实验观察孔径比可达8:1;此外,激光等离子体的产生也阻止了激光对靶面的作用,加之随孔深的增加激光发生散焦,使得烧蚀深度有一定的限制,实验观察烧蚀脉冲个数在前100个时加工效率较高.%The blind holes processing experiment is conducted on the silicon under the radiation of a 355 nm nanosecond UV repetitive pulse laser. With the increase of the laser pulse number, the variations of the silicon morphology, the depth and aperture of the blind holes are observed, and the thermodynamic process of UV laser irradiating silicon is analyzed. The results show that the formation of the blind silicon hole in the laser ablation process is due to the interaction between thermal effect and force effect. Thermal effect results in fusion, vaporization and even producing laser plasma by ionization in silicon, which is essential to the removal of the material. The molten material is compressed by the plasma shock wave and the expansion of the high-temperature gaseous material,and then ejection outward, which will benefit the further ablation; the force propagates along the laser transmission direction,perpendicular to the silicon

  12. Contralateral tactile masking between forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-03-01

    Masking effects have been demonstrated in which tactile sensitivity is affected when one touch is close to another on the body surface. Such effects are likely a result of local lateral inhibitory circuits that sharpen the spatial tuning of a given tactile receptor. Mutually inhibitory pathways have also been demonstrated between cortical tactile maps of the two halves of the body. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at contralateral locations. Here, we measure the spatial tuning and effect of posture on this contralateral masking effect. Tactile sensitivity was measured on one forearm, while vibrotactile masking stimulation was applied to the opposite arm. Results were compared to sensitivity while vibrotactile stimulation was applied to a control site on the right shoulder. Sensitivity on the forearm was reduced by over 3 dB when the arms were touching and by 0.52 dB when they were held parallel. The masking effect depended on the position of the masking stimulus. Its effectiveness fell off by 1 STD when the stimulus was 29 % of arm length from the corresponding contralateral point. This long-range inhibitory effect in the tactile system suggests a surprisingly intimate relationship between the two sides of the body.

  13. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  14. A high-end mask writer using a spatial light modulator

    Science.gov (United States)

    Ljungblad, Ulric B.; Askebjer, Per; Karlin, Tord; Sandstrom, Tor; Sjoeberg, Henrik

    2005-01-01

    This paper presents the properties of the Sigma7300 which is a commercial DUV laser pattern generator based on spatial light modulator (SLM) technology designed to meet the requirements of the 65-nm technology node and below. The introduction of spatial light modulators provides a possibility for optical mask writers to combine high resolution and accuracy with short write time making it possible to write most of the high end mask layers in a cost effective way. The Sigma7300 mask writer is developed by Micronic Laser Systems whereas the SLM, which is a combined MEMS and CMOS component with individually controllable movable micromirrors, is developed by the Fraunhofer-IPMS institute in Dresden. The SLM allows parallel writing of one million pixels with a frame rate of up to 2 kHz. The technology offers resolution enhancement advantages from stepper technology not available in other mask patterning tools.

  15. [Lasers].

    Science.gov (United States)

    Passeron, T

    2012-11-01

    Lasers are a very effective approach for treating many hyperpigmented lesions. They are the gold standard treatment for actinic lentigos and dermal hypermelanocytosis, such as Ota nevus. Becker nevus, hyperpigmented mosaicisms, and lentigines can also be successfully treated with lasers, but they could be less effective and relapses can be observed. However, lasers cannot be proposed for all types of hyperpigmentation. Thus, freckles and café-au-lait macules should not be treated as the relapses are nearly constant. Due to its complex pathophysiology, melasma has a special place in hyperpigmented dermatoses. Q-switched lasers (using standard parameters or low fluency) should not be used because of consistent relapses and the high risk of post-inflammatory hyperpigmentation. Paradoxically, targeting the vascular component of the melasma lesion with lasers could have a beneficial effect. However, these results have yet to be confirmed. In all cases, a precise diagnosis of the type of hyperpigmentation is mandatory before any laser treatment, and the limits and the potential side effects of the treatment must be clearly explained to patients. Copyright © 2012 Elsevier Masson SAS. All rights reserved.

  16. Lasers.

    Science.gov (United States)

    Passeron, T

    2012-12-01

    Lasers are a very effective approach for treating many hyperpigmented lesions. They are the gold standard treatment for actinic lentigos and dermal hypermelanocytosis, such as Ota nevus. Becker nevus, hyperpigmented mosaicisms, and lentigines can also be successfully treated with lasers, but they could be less effective and relapses can be observed. However, lasers cannot be proposed for all types of hyperpigmentation. Thus, freckles and café-au-lait macules should not be treated as the relapses are nearly constant. Due to its complex pathophysiology, melasma has a special place in hyperpigmented dermatoses. Q-switched lasers (using standard parameters or low fluency) should not be used because of consistent relapses and the high risk of post-inflammatory hyperpigmentation. Paradoxically, targeting the vascular component of the melasma lesion with lasers could have a beneficial effect. However, these results have yet to be confirmed. In all cases, a precise diagnosis of the type of hyperpigmentation is mandatory before any laser treatment, and the limits and the potential side effects of the treatment must be clearly explained to patients. Copyright © 2012 Elsevier Masson SAS. All rights reserved.

  17. Production mask composition checking flow

    Science.gov (United States)

    Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Wang, Alice; Lin, Roger; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2016-05-01

    The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations including writing, etching, metrology, etc. There still exist many potential errors that could occur when the frame, main circuit and dummies all together form a whole reticle. The MDCC flow combines the design rule check (DRC) and MRC concepts to adapt to the complex patterns in today's wafer production technologies. Although photomask data has unique characteristics, the MRC tool in Calibre® MDP can easily achieve mask composition by using the Extended MEBES job deck (EJB) format. In EJB format, we can customize the combination of any input layers in an IC design layout format, such as OASIS. Calibre MDP provides section-based processing for many standard verification rule format (SVRF) commands that support DRC-like checks on mask data. Integrating DRC-like checking with EJB for layer composition, we actually perform reticle-level DRC, which is the essence of MDCC. The flow also provides an early review environment before the photomask pattern files are available. Furthermore, to incorporate the MDCC in our production flow, runtime is one of the most important indexes we consider. When the MDCC is included in the tape-out flow, the runtime impact is very limited. Calibre, with its multi-threaded processes and good scalability, is the key to achieving acceptable runtime. In this paper, we present real case runtime data for 28nm and 14nm technology nodes, and prove the practicability of placing MDCC into mass production.

  18. Masked Hypertension in Diabetes Mellitus

    Science.gov (United States)

    Franklin, Stanley S.; Thijs, Lutgarde; Li, Yan; Hansen, Tine W.; Boggia, José; Liu, Yanping; Asayama, Kei; Björklund-Bodegård, Kristina; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Kuznetsova, Tatiana; Stolarz-Skrzypek, Katarzyna; Tikhonoff, Valérie; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Sandoya, Edgardo; Kawecka-Jaszcz, Kalina; Filipovský, Jan; Imai, Yutaka; Wang, Jiguang; Ibsen, Hans; O’Brien, Eoin; Staessen, Jan A.

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (Phypertensives tended to be higher than in normotensives (hazard rate [HR], 1.96; 95% confidence interval [CI], 0.97–3.97; P=0.059), similar to untreated stage 1 hypertensives (HR, 1.07; CI, 0.58–1.98; P=0.82), but less than stage 2 hypertensives (HR, 0.53; CI, 0.29–0.99; P=0.048). In contrast, cardiovascular risk was not significantly different in antihypertensive-treated diabetic-masked hypertensives, as compared with the normotensive comparator group (HR, 1.13; CI, 0.54–2.35; P=0.75), stage 1 hypertensives (HR, 0.91; CI, 0.49–1.69; P=0.76), and stage 2 hypertensives (HR, 0.65; CI, 0.35–1.20; P=0.17). In the untreated diabetic-masked hypertensive population, mean conventional systolic/diastolic blood pressure was 129.2±8.0/76.0±7.3 mm Hg, and mean daytime systolic/diastolic blood pressure 141.5±9.1/83.7±6.5 mm Hg. In conclusion, masked hypertension occurred in 29% of untreated diabetics, had comparable cardiovascular risk as stage 1 hypertension, and would require considerable reduction in conventional blood pressure to reach daytime ambulatory treatment goal. Importantly, many hypertensive diabetics when receiving antihypertensive therapy can present with normalized conventional and elevated ambulatory blood pressure that mimics masked hypertension. PMID:23478096

  19. Informational masking and musical training.

    Science.gov (United States)

    Oxenham, Andrew J; Fligor, Brian J; Mason, Christine R; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  20. Verification of a characterization method of the laser-induced selective activation based on industrial lasers

    DEFF Research Database (Denmark)

    Zhang, Yang; Hansen, Hans Nørgaard; Tang, Peter T.

    2013-01-01

    In this article, laser-induced selective activation (LISA) for subsequent autocatalytic copper plating is performed by several types of industrial scale lasers, including a Nd:YAG laser, a UV laser, a fiber laser, a green laser, and a short pulsed laser. Based on analysis of all the laser-machine...

  1. Antireflective surface patterned by rolling mask lithography

    Science.gov (United States)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  2. Use of laryngeal mask airway in an extremely low birth weight premature infant undergoing laser photocoagulation treatment of retinopathy of prematurity with general anesthesia%喉罩通气道全麻用于超低出生体重儿视网膜病变激光光凝术的麻醉处理

    Institute of Scientific and Technical Information of China (English)

    马兰; 张建文; 左云霞

    2013-01-01

    报道1例胎龄27+4周,现月龄1月27 d,体重1.67 kg的超低出生体重伴双眼早产儿视网膜病变(retinopathy of prematurity,ROP)的早产儿在喉罩通气道全麻下行双眼激光光凝术治疗.%This case report describes the successful use of laryngeal mask airway in an extremely low birth weight premature infant undergoing laser photocoagulation treatment.The premature infant with gestational age of 27 ~ weeks is retinopathy in both eyes,57 d old,and 1.67 kg weight.

  3. UV and IR laser induced ablation of Al2O3/SiN:H and a-Si:H/SiN:H

    Directory of Open Access Journals (Sweden)

    Schutz-Kuchly T.

    2014-01-01

    Full Text Available Experimental work on laser induced ablation of thin Al2O3(20 nm/SiN:H (70 nm and a-Si:H (20 nm/SiN:H (70 nm stacks acting, respectively, as p-type and n-type silicon surface passivation layers is reported. Results obtained using two different laser sources are compared. The stacks are efficiently removed using a femtosecond infra-red laser (1030 nm wavelength, 300 fs pulse duration but the underlying silicon surface is highly damaged in a ripple-like pattern. This collateral effect is almost completely avoided using a nanosecond ultra-violet laser (248 nm wavelength, 50 ns pulse duration, however a-Si:H flakes and Al2O3 lace remain after ablation process.

  4. Direct chemical-analysis of uv laser-ablation products of organic polymers by using selective ion monitoring mode in gas-chromatography mass-spectrometry

    Science.gov (United States)

    Cho, Yirang; Lee, H.W.; Fountain, S.T.; Lubman, D.M.

    1994-01-01

    Trace quantities of laser ablated organic polymers were analyzed by using commercial capillary column gas chromatography/mass spectrometry; the instrument was modified so that the laser ablation products could be introduced into the capillary column directly and the constituents of each peak in the chromatogram were identified by using a mass spectrometer. The present study takes advantage of the selective ion monitoring mode for significantly improving the sensitivity of the mass spectrometer as a detector, which is critical in analyzing the trace quantities and confirming the presence or absence of the species of interest in laser ablated polymers. The initial composition of the laser ablated polymers was obtained by using an electron impact reflectron time-of-flight mass spectrometer and the possible structure of the fragments observed in the spectra was proposed based on the structure of the polymers.

  5. Treatment of myopic astigmatism with photorefractive keratectomy using an erodible mask.

    Science.gov (United States)

    Cherry, P M; Tutton, M K; Bell, A; Neave, C; Fichte, C

    1994-01-01

    The Summit Technology erodible mask treatment of astigmatism does not alter the keratometric astigmatism significantly, even though the refractive astigmatism appears to improve by about 50%. Myopia is satisfactorily treated with the erodible mask, but there is slightly more undercorrection compared to photorefractive keratectomy (PRK) using an expanding diaphragm. Increasing the minus power in ordering the mask cylinder improves the myopia result, but not the keratometric astigmatism result. The following factors do not influence the keratometric astigmatism result: 1) The type of astigmatism (with-, against-the-rule, or oblique); 2) The initial keratometry readings; and 3) The time from the commencement of epithelial removal to laser treatment.

  6. Tunable high-power narrow-spectrum external-cavity diode laser at 675 nm as a pump source for UV generation

    DEFF Research Database (Denmark)

    Chi, Mingjun; Jensen, Ole Bjarlin; Erbert, Gotz;

    2011-01-01

    of 1.0 W. The laser system B based on device B is tunable from 666 to 685 nm. As high as 1.05 W output power is obtained around 675.67 nm. The emission spectral bandwidth is less than 0.07 nm throughout the tuning range, and the beam quality factor M2 is 1.13 at an output power of 0.93 W. The laser...

  7. Doping effect of L-cystine on structural, UV-visible, SHG efficiency, third order nonlinear optical, laser damage threshold and surface properties of cadmium thiourea acetate single crystal

    Science.gov (United States)

    Azhar, S. M.; Anis, Mohd; Hussaini, S. S.; Kalainathan, S.; Shirsat, M. D.; Rabbani, G.

    2017-01-01

    The present article is focused to investigate the influence of L-cystine (LC) on linear-non-linear optical and laser damage threshold of cadmium thiourea acetate (CTA) crystal. The structural parameters of pure and LC doped CTA crystals have been determined using the single crystal X-ray diffraction technique. The functional groups of grown crystals have been identified by means of fourier transform infrared (FT-IR) analysis. The UV-visible spectral analysis has been done in the range of 200-900 nm to ascertain the uplifting influence of LC on optical properties of CTA crystal. The second harmonic generation (SHG) efficiency of LC doped CTA crystal is found to be higher than CTA and KDP crystal. The Z-scan technique has been employed to determine the third order nonlinear optical (TONLO) nature of LC doped CTA crystal at 632.8 nm. The self focusing tendency confirmed the strong kerr lensing ability of LC doped CTA crystal. The TONLO susceptibility (χ3), refraction (n2) and absorption coefficient (β) has been calculated using the Z-scan data. The laser damage threshold of pure and LC doped CTA crystals has been measured using the Q-switched Nd:YAG laser and its is found to be in range of GW/cm2. The surface analysis has been done by means of etching studies.

  8. Masked illumination scheme for a galvanometer scanning high-speed confocal fluorescence microscope.

    Science.gov (United States)

    Kim, Dong Uk; Moon, Sucbei; Song, Hoseong; Kwon, Hyuk-Sang; Kim, Dug Young

    2011-01-01

    High-speed beam scanning and data acquisition in a laser scanning confocal microscope system are normally implemented with a resonant galvanometer scanner and a frame grabber. However, the nonlinear scanning speed of a resonant galvanometer can generate nonuniform photobleaching in a fluorescence sample as well as image distortion near the edges of a galvanometer scanned fluorescence image. Besides, incompatibility of signal format between a frame grabber and a point detector can lead to digitization error during data acquisition. In this article, we introduce a masked illumination scheme which can effectively decrease drawbacks in fluorescence images taken by a laser scanning confocal microscope with a resonant galvanometer and a frame grabber. We have demonstrated that the difference of photobleaching between the center and the edge of a fluorescence image can be reduced from 26 to 5% in our confocal laser scanning microscope with a square illumination mask. Another advantage of our masked illumination scheme is that the zero level or the lowest input level of an analog signal in a frame grabber can be accurately set by the dark area of a mask in our masked illumination scheme. We have experimentally demonstrated the advantages of our masked illumination method in detail.

  9. Planar Bragg gratings made by excimer-laser modification of ion-exchanged waveguides.

    Science.gov (United States)

    Montero, C; Gomez-Reino, C; Brebner, J L

    1999-11-01

    The refractive indices of planar silver-ion-exchanged waveguides have been modified by UV excimer laser irradiation (lambda=193 nm) . The effective index changes of the fundamental modes of the waveguides after exposition are as large as 2x10(-2) . The procedure permits the fabrication of integrated optical components in a direct way, with neither the use of standard lithography nor previous sensitizing of the substrate. Optical characterization of the irradiated samples is presented. By the use of appropriate masks, we have fabricated planar Bragg gratings.

  10. A laboratory experiment for a new free-standing pupil mask coronagraph

    Science.gov (United States)

    Haze, K.; Enya, K.; Kotani, T.; Abe, L.; Nakagawa, T.; Matsuhara, H.; Sato, T.; Yamamuro, T.

    2012-09-01

    This paper presents the results of a laboratory experiment on a new free-standing pupil mask coronagraph for the direct observation of exoplanets. We focused on a binary-shaped pupil coronagraph, which is planned for installation in the next-generation infrared space telescope SPICA. Our laboratory experiments on the coronagraph were implemented inside a vacuum chamber (HOCT) to achieve greater thermal stability and to avoid air turbulence, and a contrast of 1.3×10-9 was achieved with PSF subtraction. We also carried out multi-color/broadband experiments to demonstrate that the pupil mask coronagraph works, in principle, at all wavelengths. We had previously manufactured a checker-board mask, a type of binary-shaped pupil mask, on a glass substrate, which had the disadvantages of light loss by transmission, ghosting from residual reflectance and a slightly different refractive index for each wavelength. Therefore, we developed a new free-standing mask in sheet metal, for which no substrate was needed. As a result of a He-Ne laser experiment with the free-standing mask, a contrast of 1.0×10-7 was achieved for the raw coronagraphic image. We also conducted rotated mask subtractions and numerical simulations of some errors in the mask shape and WFEs. Speckles are the major limiting factor. The free-standing mask exhibited about the same ability to improve contrast as the substrate mask. Consequently, the results of this study suggest that the binary-shaped pupil mask coronagraph can be applied to coronagraphic observations by SPICA and other telescopes.

  11. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  12. Crack-free direct-writing on glass using a low-power UV laser in the manufacture of a microfluidic chip

    Science.gov (United States)

    Cheng, Ji-Yen; Yen, Meng-Hua; Wei, Cheng-Wey; Chuang, Yung-Chuan; Young, Tai-Horng

    2005-06-01

    Glass is an excellent material for use as a microfluidic chip substrate because it has great chemical and thermal stability. This work describes a flexible platform for the rapid prototyping of microfluidic chips fabricated from glass. A debris-free laser direct-writing technology that requires no photomask generation is developed. A 266 nm laser with a high repetition rate is employed in laser-induced backside wet etching (LIBWE) for glass machining. A microfluidic pattern is designed using computer drawing software and then automatically translated into computer numerical control motion so that the microtrench is directly fabricated on the glass chip. The overall machining speed can be increased by increasing the repetition rate to ~6 kHz. Without a clean room facility or the highly corrosive acid, HF, the overall development time is within hours. Trenches with complex structures that are hard to fabricate by photolithography were easily produced by laser direct-writing. An integrated microreactor/concentrator is demonstrated. The crack-free and debris-free surface was characterized by SEM and a surface profiler. Various effective etching chemicals for the LIBWE process were investigated to understand the etching mechanism. The minimal laser power used for glass etching was approximately 20 mW for a 6 µm wide microtrench. Several new compounds have been demonstrated to be effective in ablation. The etch threshold is minimum and does not decrease further as the unit length absorbance increases above 8000 in acetone solution.

  13. A study of the composition of the products of laser-induced breakdown of hexogen, octogen, pentrite and trinitrotoluene using selected ion flow tube mass spectrometry and UV-Vis spectrometry.

    Science.gov (United States)

    Sovová, Kristýna; Dryahina, Kseniya; Spanel, Patrik; Kyncl, Martin; Civis, Svatopluk

    2010-05-01

    Four types of explosives were studied using a combination of Laser Induced Breakdown Spectroscopy (LIBS) and Selected Ion Flow Tube Mass Spectrometry (SIFT-MS). The LIBS technique uses short laser pulses (ArF excimer laser) as the energy source to convert small amounts samples into plasma and to produce the emission from their molecular fragments or atoms. SIFT-MS is a novel method for absolute quantification based on chemical ionization using three precursor ions, with the capability to determine concentrations of trace gases and vapours of volatile organic compounds in real time. This is the first time that SIFT-MS has been used to study the release of NO, NO(2), HCN, HNO(3), HONO, HCHO and C(2)H(2) after a laser-induced breakdown of pure explosive compounds HMX (1,3,5,7-tetranitro-1,3,5,7-tetraazacyclo-octane), RDX (1,3,5-trinitro-2-oxo-1,3,5-triazacyclo-hexane), PETN (pentaerithrityl-tetranitrate) and TNT (2,4,6-trinitrotoluene) in solid form. The radiation emitted after excitation was analysed using a time resolving UV-Vis spectrometer with a ICCD detector. Electronic bands of the CN radical (388 nm), the Swan system of the C(2) radical (512 nm), the NH radical (336 nm), the OH radical (308.4 nm) and atomic lines of oxygen, nitrogen and hydrogen were identified. Vibrational and excitation temperatures were determined from the intensity distributions and a scheme of chemical reactions responsible for the formation of the observed species was proposed.

  14. Étude des dommages induits dans l'ADN par irradiation laser X-UV à 21.2 nm

    Science.gov (United States)

    Cassou, K.; Ros, D.; Kazamias, S.; Klisnick, A.; Jamelot, G.; Guilbaud, O.; Rus, B.; Kozlová, M.; Polan, J.; Präg, A. R.; Stupka, M.; Eot-Houllier, G.; Sage, E.; Begusová, M.; Stísová, V.; Du Penhoat, M.-A. H.; Touati, A.; Chétioui, A.

    2005-06-01

    We report the preliminary result of the application of the collisional Ne-like soft x-ray laser as radiation source to induce DNA damage. The goal of this experiment was a test bed study of the damage yields induced by soft x-ray radiation in dried plasmid DNA sample. The saturated Ne-like soft x-ray laser available at the PALS facility, delivering several millijoules in a single 100 ps pulse at 21.2 nm was used to irradiate two different plasmids: pSP189 and pBS. The study is centered on the dose effect leading to single and double strand break in DNA.

  15. All solid-state 191.7 nm deep-UV light source by seventh harmonic generation of an 888 nm pumped, Q-switched 1342 nm Nd:YVO₄ laser with excellent beam quality.

    Science.gov (United States)

    Koch, Peter; Bartschke, Juergen; L'huillier, Johannes A

    2014-06-02

    In this paper we report on the realization of a deep-UV light source using the 1.3 μm transition of neodymium as pumping wavelength. The 191.7 nm radiation was obtained by generating the seventh harmonic of a high-power Q-switched 1342 nm Nd:YVO4 laser. A cesium lithium borate crystal was used for sum frequency mixing of the sixth harmonic and the fundamental. With a total of four conversion stages, up to 240 mW were achieved, with excellent beam quality at 155 mW (M2 < 1.7) and 190 mW (M2 < 1.9).

  16. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  17. Mask qualification strategies in a wafer fab

    Science.gov (United States)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  18. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show...

  19. Super-Resolution Recording by an Organic Photochromic Mask Layer

    Institute of Scientific and Technical Information of China (English)

    SHI Ming; ZHAO Sheng-Min; YI Jia-Xiang; ZHAO Fu-Qun; NIU Li-Hong; LI Zhong-Yu; ZHANG Fu-Shi

    2007-01-01

    By using the super-resolution near-field structure(super-RENS)method,the super-resolution recording marks are obtained practically by an organic photochromic diarylethene mask layer,under much lower recording laser Dower of 0.45mW.The size of recording marks is decreased by 60% (from 1.6μm to 0.7μm) for a diarylethene (photo-mode)recording layer by the optical detection method(limited by optical diffraction),or decreased by 97%(from 1600nm to 50nm)for a heptaoxyl copper phthalocyanine(thermo-optical)recording layer,the latter is much smaller than the limitation of optical diffraction.In order to obtain a desirable result,a proper extent or Dhotochemistry reaction in the mask layer is needed.Thus,the super-resolution recording marks can be obtained by adjusting the concentration of diarylethene in the mask layer,the recording laser power,and the moving speed of the sample disc.

  20. Laser assisted removal of synthetic painting-conservation materials using UV radiation of ns and fs pulse duration: Morphological studies on model samples

    Science.gov (United States)

    Pouli, P.; Nevin, A.; Andreotti, A.; Colombini, P.; Georgiou, S.; Fotakis, C.

    2009-02-01

    In an effort to establish the optimal parameters for the cleaning of complex layers of polymers (mainly based on acrylics, vinyls, epoxys known as Elvacite, Laropal, Paraloid B72, among others) applied during past conservation treatments on the surface of wall paintings, laser cleaning tests were performed with particular emphasis on the plausible morphological modifications induced in the remaining polymeric material. Pulse duration effects were studied using laser systems of different pulse durations ( ns and fs) at 248 nm. Prior to tests on real fragments from the Monumental Cemetery in Pisa (Italy) which were coated with different polymers, attention was focused on the study of model samples consisting of analogous polymer films cast on quartz disks. Ultraviolet irradiation is strongly absorbed by the studied materials both in ns and fs irradiation regimes. However, it is demonstrated that ultrashort laser pulses result in reduced morphological alterations in comparison to ns irradiation. In addition, the dependence of the observed alterations on the chemical composition of the consolidation materials in both regimes was examined. Most importantly, it was shown that in this specific conservation problem, an optimum cleaning process may rely not only on the minimization of laser-induced morphological changes but also on the exploitation of the conditions that favour the disruption of the adhesion between the synthetic material and the painting.

  1. Influence of surface melting effects and availability of reagent ions on LDI-MS efficiency after UV laser irradiation of Pd nanostructures.

    Science.gov (United States)

    Silina, Yuliya E; Koch, Marcus; Volmer, Dietrich A

    2015-03-01

    In this study, the influence of surface morphology, reagent ions and surface restructuring effects on atmospheric pressure laser desorption/ionization (LDI) for small molecules after laser irradiation of palladium self-assembled nanoparticular (Pd-NP) structures has been systematically studied. The dominant role of surface morphology during the LDI process, which was previously shown for silicon-based substrates, has not been investigated for metal-based substrates before. In our experiments, we demonstrated that both the presence of reagent ions and surface reorganization effects--in particular, melting--during laser irradiation was required for LDI activity of the substrate. The synthesized Pd nanostructures with diameters ranging from 60 to 180 nm started to melt at similar temperatures, viz. 890-898 K. These materials exhibited different LDI efficiencies, however, with Pd-NP materials being the most effective surface in our experiments. Pd nanostructures of diameters >400-800 nm started to melt at higher temperatures, >1000 K, making such targets more resistant to laser irradiation, with subsequent loss of LDI activity. Our data demonstrated that both melting of the surface structures and the presence of reagent ions were essential for efficient LDI of the investigated low molecular weight compounds. This dependence of LDI on melting points was exploited further to improve the performance of Pd-NP-based sampling targets. For example, adding sodium hypophosphite as reducing agent to Pd electrolyte solutions during synthesis lowered the melting points of the Pd-NP materials and subsequently gave reduced laser fluence requirements for LDI.

  2. Dye-sensitized solar cells using laser processing techniques

    Science.gov (United States)

    Kim, Heungsoo; Pique, Alberto; Kushto, Gary P.; Auyeung, Raymond C. Y.; Lee, S. H.; Arnold, Craig B.; Kafafi, Zakia H.

    2004-07-01

    Laser processing techniques, such as laser direct-write (LDW) and laser sintering, have been used to deposit mesoporous nanocrystalline TiO2 (nc-TiO2) films for use in dye-sensitized solar cells. LDW enables the fabrication of conformal structures containing metals, ceramics, polymers and composites on rigid and flexible substrates without the use of masks or additional patterning techniques. The transferred material maintains a porous, high surface area structure that is ideally suited for dye-sensitized solar cells. In this experiment, a pulsed UV laser (355nm) is used to forward transfer a paste of commercial TiO2 nanopowder (P25) onto transparent conducting electrodes on flexible polyethyleneterephthalate (PET) and rigid glass substrates. For the cells based on flexible PET substrates, the transferred TiO2 layers were sintered using an in-situ laser to improve electron paths without damaging PET substrates. In this paper, we demonstrate the use of laser processing techniques to produce nc-TiO2 films (~10 μm thickness) on glass for use in dye-sensitized solar cells (Voc = 690 mV, Jsc = 8.7 mA/cm2, ff = 0.67, η = 4.0 % at 100 mW/cm2). This work was supported by the Office of Naval Research.

  3. Exhaled air dispersion during coughing with and without wearing a surgical or N95 mask.

    Directory of Open Access Journals (Sweden)

    David S Hui

    Full Text Available OBJECTIVES: We compared the expelled air dispersion distances during coughing from a human patient simulator (HPS lying at 45° with and without wearing a surgical mask or N95 mask in a negative pressure isolation room. METHODS: Airflow was marked with intrapulmonary smoke. Coughing bouts were generated by short bursts of oxygen flow at 650, 320, and 220L/min to simulate normal, mild and poor coughing efforts, respectively. The coughing jet was revealed by laser light-sheet and images were captured by high definition video. Smoke concentration in the plume was estimated from the light scattered by smoke particles. Significant exposure was arbitrarily defined where there was ≥ 20% of normalized smoke concentration. RESULTS: During normal cough, expelled air dispersion distances were 68, 30 and 15 cm along the median sagittal plane when the HPS wore no mask, a surgical mask and a N95 mask, respectively. In moderate lung injury, the corresponding air dispersion distances for mild coughing efforts were reduced to 55, 27 and 14 cm, respectively, p < 0.001. The distances were reduced to 30, 24 and 12 cm, respectively during poor coughing effort as in severe lung injury. Lateral dispersion distances during normal cough were 0, 28 and 15 cm when the HPS wore no mask, a surgical mask and a N95 mask, respectively. CONCLUSIONS: Normal cough produced a turbulent jet about 0.7 m towards the end of the bed from the recumbent subject. N95 mask was more effective than surgical mask in preventing expelled air leakage during coughing but there was still significant sideway leakage.

  4. Shadows alter facial expressions of Noh masks.

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety)", which highly appreciates subtle emotional expressions in the darkness.

  5. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  6. Spatial release from informational masking

    Science.gov (United States)

    Rakerd, Brad; Aaronson, Neil L.

    2001-05-01

    A new method for investigating spatial release from informational masking was developed and employed in two experiments. The new method is computer controlled and efficient. It employs the versatile coordinate response measure speech stimulus set [Bolia et al., J. Acoust. Soc. Am. 107, 1065 (2000)]. The experiments were conducted in an anechoic room, with a primary loudspeaker in front of the listener and a secondary loudspeaker at 60 deg to the right. Target messages were presented from the primary speaker only. For a standard, distractor messages, simultaneous with the target, were also presented from the primary speaker only. Spatial release was measured by presenting the distractors from both primary and secondary speakers with a temporal offset. Experiment 1 fixed the offset (secondary leading, +4 ms) and varied the number of distractors (1 to 3) and the target-to-distractor ratio (-12 to +4 dB). Masking release, sometimes as large as 10 dB, was found for all combinations of these variables. Experiment 2 varied the offset over a wide range of values. Substantial release from masking was found for both positive and negative offsets, but only in the range in which speech echoes are suppressed (<50 ms). [Work supported by NIDCD grant DC 00181.

  7. Potentialités des lasers à fibre dans la génération de rayonnement cohérent UV

    Science.gov (United States)

    Martel, G.; Hideur, A.; Ortaç, B.; Lecourt, J.-B.; Chédot, C.; Brunel, M.; Chéron, B.; Limpert, J.; Tunnermann, T.; Grelu, Ph.; Gicquel-Guézo, M.; Labbé, C.; Loualiche, S.; Roussignol, Ph.; Sanchez, F.; Leblond, H.

    2006-12-01

    Le premier laser à fibre dopé aux ions de terres rares fonctionna au tout début des années 60. Il fournissait quelques milliwatts autour de 1 μm. Les décades suivantes virent très peu d'améliorations tant du côté des laboratoires que du point de vue industriel. La dernière décennie (1995/2005) vit se concrétiser la seconde révolution des lasers à fibres. Déjà kilowatt en continu, ils atteignent désormais les 1013 watts/cm2 avec des impulsions de la centaine de femtoseconde. Lors de cette présentation nous passerons en revue les potentialités des lasers à fibre. Nous décrirons les verrous technologiques qui ont été levés ces dix dernières années pour les régimes CW mais aussi femtosecondes. Nous montrerons également comment la prochaine génération de fibres optiques actuellement en développement permettra d'offrir des sources stables et de très haute puissance pour l'avenir proche.

  8. Modal analysis of the SCALPEL mask using experimental and numerical methods

    Science.gov (United States)

    Semke, William H.; Schlax, Michael P.; Engelstad, Roxann L.; Lovell, Edward G.; Liddle, James A.

    1999-06-01

    Controlling the dynamic response of the SCALPEL mask is important to ensure high throughput consistent with the stringent error budgets allocated for sub-130 nm lithography. In this paper experimental and numerical modal analysis result for the SCALPEL mask are presented and compared. These experimental result are used to verify and benchmark the finite element modeling efforts. The mode shapes and their respective frequencies provide valuable information for characterizing the out-of-plane and in-plane oscillations of the mask. The out-of-plane mode shapes were found experimentally with the use of both a Zygo interferometer and a Polytec scanning laser vibrometer. An additional application for out-of-plane oscillations involves a SCALPEL mask cleaning procedure, called the PLAMAX process, where the mask is resonated at its natural frequencies while surface particles are electrostatically charged in the present of a plasma and removed. The in-plane vibrations of the SCALPEL mask have also been investigated, since this is the primary excitation mode of the mask during exposure stepping. For experimental data, the in-plane modes were excited mechanically and detected using a MTI Fotonic sensor fiber-optic probe.

  9. Ramage Repair for Enhanced Ultraviolet-B Radiation on Antioxidant System of Arabiodopsis by He-Ne Laser%He-Ne激光对增强UV-B辐射拟南芥抗氧化系统的损伤修复

    Institute of Scientific and Technical Information of China (English)

    姜晓燕; 高丽美; 李永峰; 韩榕

    2011-01-01

    以培养6周左右的拟南芥为材料,采用UV-B辐射(剂量1 KJ/m2/d)和He-Ne激光器(波长632.8 nm,输出功率5 mW·mm2,辐照时间60 s)对材料进行处理,分成CK(没有经过UV-B或激光辐照)组、B(UV-B辐射)组、BL(UV-B和激光复合处理)组和L(激光辐照)组4个不同处理组.结果表明:增强的UV-B辐射拟南芥幼苗导致MDA(Malondialdehyde)、超氧阴离子含量升高,GSH(Glutathione)含量降低,PAL(phenylalanine ammomia-lyase)、CAT(catalase)和APX(ascorbate peroxidase)活性升高,SOD(supemxide dismutas)活性降低.单独He-Ne激光处理使MDA、超氧阴离子含量降低,GSH的含量升高,SOD、APX、CAT的活性升高,PAL的活性降低.UV-B辐射后再用He-Ne激光进行后处理,发现与单独UV-B辐照处理相比,MDA、超氧阴离子含量降低,GSH含量升高,SOD、APX、CAT的活性升高了,PAL的活性降低了.因此激光在一定程度上提高了拟南芥叶片抗氧化能力,在此基础上讨论了其可能的形成机理.%Taking Arabidopsis trqined about six weeks as the material, UV-B radiation(1 kJ/m2/d) and HeNe laser irradiation(wavelen 632.8 nm output power 5 mW · mm2 , irradiation time 60 s) were used to process the material. The Arabidopsis were divided into four treatment groups including CK(not treated ),L(He-Ne laser) ,B(UV-B), and BL(UV-B +He-Ne laser). The experimental results show that enhanced UV-B increases the contents of MDA, O2-and the activities of PAL, CAT, APX , while SOD activity and the content of GSH decrease. But He-Ne laser irradiation reduces the contents of MDA and O2- ,the PAL activity, and increases SOD activity, APX activity, CAT activity, the content of GSH . In contrast to B group, both enhanced UV-B and He-Ne laser have similar results which indicated by He-Ne laser irradiation. The results prove that laser can improve the ability of antioxidant system in Arabidopsis.

  10. High performance mask fabrication process for the next-generation mask production

    Science.gov (United States)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2014-07-01

    ArF immersion lithography combined with double patterning has been used for fabricating below half pitch 40nm devices. However, when pattern size shrinks below 20nm, we must use new technology like quadruple patterning process or next generation lithography (NGL) solutions. Moreover, with change in lithography tool, next generation mask production will be needed. According to ITRS 2013, fabrication of finer patterns less than 15nm will be required on mask plate in NGL mask production 5 years later [1]. In order to fabricate finer patterns on mask, higher resolution EB mask writer and high performance fabrication process will be required. In a previous study, we investigated a potential of mask fabrication process for finer patterning and achieved 17nm dense line pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer and chemically amplified resist [2][3]. After a further investigation, we constructed higher performance mask process by using new EB mask writer EBM9000. EBM9000 is the equipment supporting hp16nm generation's photomask production and has high accuracy and high throughput. As a result, we achieved 15.5nm pattern on mask with high productivity. Moreover, from evaluation of isolated pattern, we proved that current mask process has the capability for sub-10nm pattern. These results show that the performance of current mask fabrication process have the potential to fabricate the next-generation mask.

  11. Mask data volume: explosion or damp squib?

    Science.gov (United States)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell

    2005-11-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  12. UV-radiation-induced degradation of fluorinated polyimide films

    Science.gov (United States)

    Chang, Li-Hsin; Saha, Naresh C.

    1994-12-01

    Fully cured fluorinated polyimide (FPI) films with low dielectric constants ( less than or equal to 3.0) have been found to be chemically altered when exposed to UV radiation during a process integration study. This chemical modification is manifested in the loss of film thickness after it is subjected to UV radiation followed by photoresist stripping. The UV-radiation-induced surface modifications of the FPI film have been characterized by X-ray photoelectron spectroscopy (XPS). The XPS data show the presence of C=O and COO(-) sites in the FPI molecule following UV exposure. Under prolonged UV exposure in a stepper, the FPI film acts as a positive working photoresist. However, a 2 kA plasma enhanced chemically vapor-deposited oxide mask and/or a typical 12 kA photoresist mask effectively shields the FPI from UV-radiation-induced degradation. The effects of FPI on UV radiation present during other normal wafer processing steps such as plasma deposition and reactive ion-etching were also studied and found to be negligible.

  13. Qualitative and quantitative spectro-chemical analysis of dates using UV-pulsed laser induced breakdown spectroscopy and inductively coupled plasma mass spectrometry.

    Science.gov (United States)

    Mehder, A O; Habibullah, Y B; Gondal, M A; Baig, Umair

    2016-08-01

    Laser Induced Breakdown Spectroscopy (LIBS) is demonstrated for the spectral analysis of nutritional and toxic elements present in several varieties of date fruit samples available in the Saudi Arabia market. The method analyzes the optical emission of a test sample when subjected to pulsed laser ablation. In this demonstration, our primary focus is on calcium (Ca) and magnesium (Mg), as nutritional elements, and on chromium (Cr), as a toxic element. The local thermodynamic equilibrium (LTE) condition was confirmed prior to the elemental characterization of date samples to ensure accuracy of the LIBS analysis. This was achieved by measuring parameters associated with the plasma, such as the electron temperature and the electron number density. These plasma parameters aid interpretation of processes such as ionization, dissociation, and excitation occurring in the plasma plume formed by ablating the date palm sample. The minimum detection limit was established from calibration curves that involved plotting the LIBS signal intensity as a function of standard date samples with known concentrations. The concentration of Ca and Mg detected in different varieties of date samples was between 187 and 515 and 35-196mgL(-1) respectively, while Cr concentration measured between 1.72 and 7.76mgL(-1). In order to optimize our LIBS system, we have studied how the LIBS signal intensity depends on the incident laser energy and the delay time. In order to validate our LIBS analysis results, standard techniques such as inductively coupled plasma mass spectrometry (ICP-MS) were also applied on an identical (duplicate) date samples as those used for the LIBS analysis. The LIBS results exhibit remarkable agreement with those obtained from the ICP-MS analysis. In addition, the finger print wavelengths of other elements present in date samples were also identified and are reported here, which has not been previously reported, to the best of our knowledge. Copyright © 2016 Elsevier B

  14. Pattern generation requirements for mask making beyond 130 nm

    Science.gov (United States)

    Abboud, Frank E.; Gesley, Mark A.; Maldonado, Juan R.

    1998-06-01

    It is commonly accepted in the semiconductor industry that optical lithography will be the most cost-effective solution for 150 nm and 130 nm device generations. Some selected layers at the 130 nm device generation may be produced using electron-beam direct-write or x-ray during the development phase. However, for the production phase, it is expected that 193 nm optical lithography with reticle enhancement techniques such as optical proximity correction (OPC) and phase shift masks (PSM) will be the technology of choice. What about post 193 nm. The range of solutions is more diverse and a clear winner has not yet emerged. The topic, however, is becoming more visible and has taken a prominent place in technical conferences in the past year. The five leading potential alternatives to optical lithography are proximity x-ray, e-beam projection (EBP), extended UV (EUV), ion projection lithography (IPL), and e-beam direct write. The search for the right answer will most likely continue for a few years, and possibly more than one alternative will emerge as an effective solution at and below 100 nm. All of the alternatives, with the exception of e-beam direct write, have one thing in common, the mask. Except for proximity x- ray, all solutions at present envision a 4x reduction of the mask-to-wafer image plane. Instead of chrome-coated quartz, a silicon wafer substrate is used. Aside from patterning, mask fabrication varies depending on the lithography absorbing substrate, and EUV requires a reflective multilayer stack. Most key lithography requirements needed to pattern the imaging layer are common to all of the candidates, at least for the reduction methods. For x-ray lithography, the requirements are significantly more stringent but at a smaller field. This paper will consolidate the requirements of the various types of masks from a pattern generation point of view and will focus on the pattern generation tool requirements to meet those mask requirements. In addition, it

  15. Generation of UV laser light by stimulated Raman scattering in D2, D2/Ar and D2/He using a pulsed Nd:YAG laser at 355nm

    Institute of Scientific and Technical Information of China (English)

    徐贲; 岳古明; 张寅超; 胡欢陵; 周军; 胡顺星

    2003-01-01

    A pulsed Nd:YAG laser at 355nm is used to pump Raman cell filled with D2,D2/Ar and D2/He.With adequately adjusted parameters,the maximum photon conversion efficiency of the first-order Stokes light(S1,396.796nm)reaches 33.33% in D2/Ar and the stability of S1 in pure D2 is fairly high,the energy drift being less than 10% when the pump energy drifts in the range of 5%.The conversion efficiency and stability,which are functions of the composition and pressure of the Raman medium and the energy of pump laser,are investigated.The result has been used to optimize the laser transmitter system for a differential absorption lidar system to measure NO2 concentration profiles.

  16. Helical apodizers for tunable hyper Gaussian masks

    Science.gov (United States)

    Ojeda-Castañeda, J.; Ledesma, Sergio; Gómez-Sarabia, Cristina M.

    2013-09-01

    We discuss an optical method for controlling the half-width of Gaussian like transmittance windows, by using a pair of absorption masks that have both radial and helical amplitude variations. For describing the radial part of the proposed masks, we employ amplitude transmittance profiles of the form T(ρ) = exp(- ρ s ). For s = 2, one has an amplitude transmittance that is proportional to a Gaussian function. A sub Gaussian mask is defined by a value of s 2, one has super Gaussian masks. Our discussion considers that any of these radially varying masks has also helical modulations. We show that by using a suitable pair of this type of masks, one can control the halfwidth of Gaussian like windows.

  17. UV LED lithography with digitally tunable exposure dose

    Science.gov (United States)

    Yapici, Murat Kaya; Farhat, Ilyas

    2014-10-01

    This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based ultraviolet (UV) exposure system. The major system components include UV-LEDs, a microcontroller, a digital-to-analog converter, and LED control circuitry. Through its front panel with a liquid crystal display and keypad, the UV-LED lithography system is able to receive user-defined values for exposure time and power, which allows the exposure dose to be tunable on demand. Compared to standard mask aligners, the UV-LED lithography system is a fraction of the cost, is simpler to construct using off-the shelf components, and does not require a complex infrastructure to operate. Such a reduction in system cost and complexity renders UV-LED lithography a perfect candidate for microlithography with large process windows typically suitable for MEMS, microfluidics applications.

  18. Computational defect review for actinic mask inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram

    2013-04-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The limitation of 1.35 NA posed by water-based lithography has led to the application of various resolution enhancement techniques (RET), for example, use of strong phase-shifting masks, aggressive OPC and sub-resolution assist features, customized illuminators, etc. The adoption of these RET techniques combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for a mask inspection engineer. Inspecting masks under their actinic-aerial image conditions would detect defects that are more likely to print under those exposure conditions. However, this also makes reviewing such defects in their low-contrast aerial images very challenging. On the other hand, inspecting masks under higher resolution inspection optics would allow for better viewing of defects post-inspection. However, such inspections generally would also detect many more defects, including printable and nuisance, thereby making it difficult to judge which are of real concern for printability on wafer. Often, an inspection engineer may choose to use Aerial and/or high resolution inspection modes depending on where in the process flow the mask is and the specific device-layer characteristics of the mask. Hence, a comprehensive approach is needed in handling defects both post-aerial and post-high resolution inspections. This analysis system is designed for the Applied Materials Aera™ mask inspection platform, all data reported was collected using the Aera.

  19. Effect of heat treatment on UV-laser-induced positive ion desorption in CaHPO4.2H2O

    Science.gov (United States)

    Kawaguchi, Y.; Dawes, M. L.; Langford, S. C.; Dickinson, J. T.

    We have investigated KrF excimer-laser-induced positive ion desorption from single-crystal brushite (CaHPO4.2H2O), a model biomineral containing water, and we show the effect of heat treatment on ion desorption. Time-of-flight peaks of Ca+ desorption from the heated-cleaved surface are similar to those from as-cleaved ones, but the ion intensity is 2 to 4 orders of magnitude larger. In addition to Ca+, desorption of CaO+, PO+, and P+ from the heated surface is also strongly enhanced. The heated-cleaved surface shows rough, platelet-like fine structures due to recrystallization. Surface defects created during recrystallization strongly couple with the 5 eV photons and dramatically enhance ion desorption.

  20. Influence of the Electronic Structure and Optical Properties of CeO2 and UO2 for Characterization with UV-Laser Assisted Atom Probe Tomography

    Energy Technology Data Exchange (ETDEWEB)

    Billy Valderrama; H.B. Henderson; C. Yablinsky; J. Gan; T.R. Allen; M.V. Manuel

    2015-09-01

    Oxide materials are used in numerous applications such as thermal barrier coatings, nuclear fuels, and electrical conductors and sensors, all applications where nanometer-scale stoichiometric changes can affect functional properties. Atom probe tomography can be used to characterize the precise chemical distribution of individual species and spatially quantify the oxygen to metal ratio at the nanometer scale. However, atom probe analysis of oxides can be accompanied by measurement artifacts caused by laser-material interactions. In this investigation, two technologically relevant oxide materials with the same crystal structure and an anion to cation ratio of 2.00, pure cerium oxide (CeO2) and uranium oxide (UO2) are studied. It was determined that electronic structure, optical properties, heat transfer properties, and oxide stability strongly affect their evaporation behavior, thus altering their measured stoichiometry, with thermal conductance and thermodynamic stability being strong factors.

  1. X-ray lithography masking

    Science.gov (United States)

    Smith, Henry I. (Inventor); Lim, Michael (Inventor); Carter, James (Inventor); Schattenburg, Mark (Inventor)

    1998-01-01

    X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

  2. Effect of mesh patterning with UV pulsed-laser on optical and electrical properties of ZnO/Ag-Ti thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kao, K.S. [Department of Computer and Communication, SHU-TE University, 59, Hengshan Rd., Yanchao, Kaohsiung County, Taiwan (China); Cheng, D.L., E-mail: dlcheng@stu.edu.tw [Department of Computer and Communication, SHU-TE University, 59, Hengshan Rd., Yanchao, Kaohsiung County, Taiwan (China); Chang, S.H. [Department of Computer and Communication, SHU-TE University, 59, Hengshan Rd., Yanchao, Kaohsiung County, Taiwan (China); Hsieh, P.T. [Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan (China); Chin, H.S. [Opto-Electronics System Section Metal Industries Research and Development Center, Kaohsiung, Taiwan (China); Lin, H.K. [Laser Application Technology Center/Industrial Technology Research Institute South, Liujia Shiang, Taiwan (China)

    2010-10-01

    In this study, the ZnO/Ag-Ti structure for transparence conducting oxide (TCO) is investigated by optimizing the thickness of the Ag-Ti alloy and ZnO layers. The Ag-Ti thin film is deposited by DC magnetron sputtering and its thicknesses is well controlled. The ZnO thin film is prepared by sol-gel method using zinc acetate as cation source, 2-methoxiethanol as solvent and monoethanolamine as solution stabilizer. The ZnO film deposition is performed by spin-coating technique and dried at 150 deg. C on Corning 1737 glass. Due to the conductivity of ZnO/Ag-Ti is dominated by Ag-Ti, the sheet resistance of ZnO/Ag-Ti decrease dramatically as the thickness of Ag-Ti layer increases. However, the transmittances of ZnO/Ag-Ti become unacceptable for TCO application after the thickness of Ag-Ti layer beyond 6 nm. The as-deposited ZnO/Ag-Ti structure has the optical transmittance of 83% - 500 nm and the low resistivity of 1.2 x 10{sup -5} {Omega}-cm. Furthermore, for improving the optical and electrical properties of ZnO/Ag-Ti, the thermal treatment using laser is adopted. Experimental results indicate that the transmittance of ZnO/Ag-Ti is improved from 83% to 89% - 500 nm with resistivity of 1.02 x 10{sup -5} {Omega}-cm after laser drilling. The optical spectrum, the resistance, and the morphology of the ZnO/Ag-Ti will be reported in the study.

  3. UV-NIL template making and imprint evaluation

    Science.gov (United States)

    Sasaki, Shiho; Hiraka, Takaaki; Mizuochi, Jun; Nakanishi, Yuko; Yusa, Satoshi; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

    2009-03-01

    UV NIL shows excellent resolution capability with remarkable low line edge roughness, and has been attracting pioneers in the industry who were searching for the finest patterns. We have been focused on the resolution improvement in mask making, and with a 100keV acceleration voltage spot beam EB writer process, we have achieved down to 16nm resolution, and have established a mask making process to meet the requirements of the pioneers. Usually such masks needed just a small field (several hundred microns square or so). At the same time, UV NIL exploration has reached the step of feasibility study for mass production, and full chip field masks have been required, though the resolution demand is not as tough as for the extremely advanced usage mentioned above. The 100kV EB writers are adopting spot beams to generate the pattern and have a fatally low throughput if we need full chip writing. So for full chip masks, we have started the adoption of 50keV variable shaped beam (VSB) EB writers, which are used in current 4X photomask manufacturing In this paper, we will show latest results both with the 100kV spot beam writer and the 50keV VSB EB writers. With the 100kV spot beam writer, we achieved 16nm resolution, but found that to achieve further improvement, an innovation in pattern generation method or material would be inevitable. With the 50kV VSB writers, we could generate full chip pattern in a reasonable time, and by choosing the right patterning material and process, we could achieve resolution down to 32nm. Our initial results of 32nm class NIL masks with full chip field size will be shown and resolution improvement plan to further technology nodes will be discussed. Eventually, NIL is coming closer to production stage. We will also start the discussion about the infrastructures necessary for NIL mask manufacturing in this paper.

  4. IR/UV and UV/UV double-resonance study of guaiacol and eugenol dimers

    Science.gov (United States)

    Longarte, Asier; Redondo, Carolina; Fernández, José A.; Castaño, Fernando

    2005-04-01

    Guaiacol (2-methoxyphenol) and eugenol (4-allyl-2-methoxyphenol) molecules are biologically active phenol derivatives with an intramolecular -OH⋯OCH3 hydrogen bond (H bond). Pulsed supersonic expansions of mixtures of either of the two molecules with He yield weakly bound homodimers as well as other higher-order complexes. A number of complementary and powerful laser spectroscopic techniques, including UV-UV and IR-UV double resonances, have been employed to interrogate the species formed in the expansion in order to get information on their structures and spectroscopic properties. The interpretation of the spectra of eugenol dimer is complex and required a previous investigation on a similar but simpler molecule both to gain insight into the possible structures and support the conclusions. Guaiacol (2-methoxyphenol) has been used for that purpose. The combination of the broad laser study combined with ab initio calculations at the Becke 3 Lee-Yang-Parr/6-31+G(d) level has provided the isomer structures, the potential-energy wells, and shed light on the inter- and intramolecular interactions involved. Guaiacol homodimer has been shown to have a single isomer whereas eugenol dimer has at least two. The comparison between the computed geometries of the dimers, their respective energies, and the vibrational normal modes permits the identification of the spectra.

  5. Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics

    Science.gov (United States)

    Flury, M.; Benatmane, A.; Gérard, P.; Montgomery, P. C.; Fontaine, J.; Engel, T.; Schunck, J. P.; Fogarassy, E.

    2003-03-01

    We propose a low cost technique for the production of diffractive optical elements (DOE). These elements are devoted to high power lasers beam shaping in the mid-infrared wavelengths. This process called laser ablation lithography (LAL), may seem similar to laser beam writing (LBW) in the way the whole DOE's design is reproduced pixel by pixel on the substrate placed on a computer controlled XY translation stage. A first difference is that the photoresist is not exposed with UV light but is directly ablated with short excimer laser pulses. Furthermore, with LAL technique the size of the smallest pixel ( 5 μm×5 μm) is more than 10 times greater than those produced by LBW. We discuss in details the experimental set-up for LAL and demonstrate that it gives a resolution up to 10 times greater than photolithography with flexible masks. This makes LAL a promising solution for the production of DOE for use with Nd:YAG lasers. New applications of DOEs are finally introduced with high power lasers sources, such as laser marking or multi-point brazing.

  6. Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

    Science.gov (United States)

    Liebmann, Lars W.; Graur, Ioana C.; Leipold, William C.; Oberschmidt, James M.; O'Grady, David S.; Regaill, Denis

    1999-07-01

    While the benefits of alternating phase shifted masks in improving lithographic process windows at increased resolution are well known throughout the lithography community, broad implementation of this potentially powerful technique has been slow due to the inherent complexity of the layout design and mask manufacturing process. This paper will review a project undertaken at IBM's Semiconductor Research and Development Center and Mask Manufacturing and Development facility to understand the technical and logistical issues associated with the application of alternating phase shifted mask technology to the gate level of a full microprocessor chip. The work presented here depicts an important milestone toward integration of alternating phase shifted masks into the manufacturing process by demonstrating an automated design solution and yielding a functional alternating phase shifted mask. The design conversion of the microprocessor gate level to a conjugate twin shifter alternating phase shift layout was accomplished with IBM's internal design system that automatically scaled the design, added required phase regions, and resolved phase conflicts. The subsequent fabrication of a nearly defect free phase shifted mask, as verified by SEM based die to die inspection, highlights the maturity of the alternating phase shifted mask manufacturing process in IBM's internal mask facility. Well defined and recognized challenges in mask inspection and repair remain and the layout of alternating phase shifted masks present a design and data preparation overhead, but the data presented here demonstrate the feasibility of designing and building manufacturing quality alternating phase shifted masks for the gate level of a microprocessor.

  7. Model-based mask verification on critical 45nm logic masks

    Science.gov (United States)

    Sundermann, F.; Foussadier, F.; Takigawa, T.; Wiley, J.; Vacca, A.; Depre, L.; Chen, G.; Bai, S.; Wang, J.-S.; Howell, R.; Arnoux, V.; Hayano, K.; Narukawa, S.; Kawashima, S.; Mohri, H.; Hayashi, N.; Miyashita, H.; Trouiller, Y.; Robert, F.; Vautrin, F.; Kerrien, G.; Planchot, J.; Martinelli, C.; Di-Maria, J. L.; Farys, V.; Vandewalle, B.; Perraud, L.; Le Denmat, J. C.; Villaret, A.; Gardin, C.; Yesilada, E.; Saied, M.

    2008-05-01

    In the continuous battle to improve critical dimension (CD) uniformity, especially for 45-nanometer (nm) logic advanced products, one important recent advance is the ability to accurately predict the mask CD uniformity contribution to the overall global wafer CD error budget. In most wafer process simulation models, mask error contribution is embedded in the optical and/or resist models. We have separated the mask effects, however, by creating a short-range mask process model (MPM) for each unique mask process and a long-range CD uniformity mask bias map (MBM) for each individual mask. By establishing a mask bias map, we are able to incorporate the mask CD uniformity signature into our modelling simulations and measure the effects on global wafer CD uniformity and hotspots. We also have examined several ways of proving the efficiency of this approach, including the analysis of OPC hot spot signatures with and without the mask bias map (see Figure 1) and by comparing the precision of the model contour prediction to wafer SEM images. In this paper we will show the different steps of mask bias map generation and use for advanced 45nm logic node layers, along with the current results of this new dynamic application to improve hot spot verification through Brion Technologies' model-based mask verification loop.

  8. Shadows Alter Facial Expressions of Noh Masks

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  9. UV fluorescence enhancement from nanostructured aluminum materials

    Science.gov (United States)

    Montanari, Danielle E.; Dean, Nathan; Poston, Pete E.; Blair, Steve; Harris, Joel M.

    2016-09-01

    Interest in label-free detection of biomolecules has given rise to the need for UV plasmonic materials. DNA bases and amino acid residues have electronic resonances in the UV which allow for sensitive detection of these species by surface-enhanced UV fluorescence spectroscopy. Electrochemical roughening has been used extensively to generate plasmonically-active metal surfaces that produce localized enhancement of excitation and emission of electromagnetic radiation from surface-bound molecules. Electrochemically roughened gold and silver surfaces produce enhancement in the visible and near-IR regions, but to the best of our knowledge, application of this technique for producing UV-enhancing substrates has not been reported. Using electropolishing of aluminum, we are able to generate nanostructured surfaces that produce enhanced spectroscopic detection of molecules in the UV. Aluminum is a natural choice for substrate composition as it exhibits a relatively large quality factor in the UV. We have fabricated electropolished aluminum films with nanometer scale roughness and have studied UV-excited fluorescence enhancement from submonolayer coverage of tryptophan on these substrates using a UV-laser based spectrometer. Quantitative dosing by dip-coating was used to deposit known surface concentrations of the aromatic amino acid tryptophan, so that fluorescence enhancement could be evaluated. Compared to a dielectric substrate (surface-oxidized silicon), we observe a 180-fold enhancement in the total fluorescence emitted by tryptophan on electropolished aluminum under photobleaching conditions, allowing detection of sub-monolayer coverages of molecules essential for development of biosensor technologies.

  10. Laser spectroscopy

    CERN Document Server

    Demtröder, Wolfgang

    2008-01-01

    Keeping abreast of the latest techniques and applications, this new edition of the standard reference and graduate text on laser spectroscopy has been completely revised and expanded. While the general concept is unchanged, the new edition features a broad array of new material, e.g., frequency doubling in external cavities, reliable cw-parametric oscillators, tunable narrow-band UV sources, more sensitive detection techniques, tunable femtosecond and sub-femtosecond lasers (X-ray region and the attosecond range), control of atomic and molecular excitations, frequency combs able to synchronize independent femtosecond lasers, coherent matter waves, and still more applications in chemical analysis, medical diagnostics, and engineering.

  11. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  12. Laboratory demonstration of an optical vortex mask coronagraph using photonic crystal

    Science.gov (United States)

    Murakami, N.; Baba, N.; Ise, A.; Sakamoto, M.; Oka, K.

    2010-10-01

    Photonic crystal, artificial periodic nanostructure, is an attractive device for constructing focal-plane phase-mask coronagraphs such as segmented phase masks (four-quadrant, eight-octant, and 4N-segmented ones) and an optical vortex mask (OVM), because of its extremely small manufacturing defect. Recently, speckle-noise limited contrast has been demonstrated for two monochromatic lasers by using the eight-octant phase-mask made of the photonic crystal (Murakami et al. 2010, ApJ, 714, 772). We applied the photonic-crystal device to the OVM coronagraph. The OVM is more advantageous over the segmented phase masks because it does not have discontinuities other than a central singular point and provides a full on-sky field of view. For generating an achromatic optical vortex, we manufactured an axially-symmetric half-wave plate (ASHWP). It is expected that a size of the manufacturing defect due to the central singularity is an order of several hundreds nanometers. The ASHWP is placed between two circular polarizers for modulating a Pancharatnam phase. A continuous spiral phase modulation is then implemented achromatically. We carried out preliminary laboratory demonstration of the OVM coronagraph using two monochromatic lasers as a model star (wavelengths of 532 nm and 633 nm). We report a principle of the achromatic optical-vortex generation, and results of the laboratory demonstration of the OVM coronagraph.

  13. 紫外氦氖诱变选育高产聚苹果酸菌株%Breeding of High Poly (Malic Acid)-Producing Mutation Induced by UV, He and Ne laser

    Institute of Scientific and Technical Information of China (English)

    乔长晟; 郝华旋; 姜少丽; 敖爱华; 王坤

    2011-01-01

    In this study, ninety mutants with acid-producing capabilities were induced from Aureobasidium Pullulans TKPM00006 by UV and He Ne laser. Then they were primarily screened by Bromocresol green and the only carbon source fermentation of succinic acid and citric acid. Through the determination of poly (malic acid)-producing capability, a high poly (malic acid)-producing mutant was obtained. With this strain, PMLA yield reached 12.62g/L> which was 2.97 times than its parent strain. The results showed that the mutant was genetically stable.%以出芽短梗霉(Aureobasidium Pullulans) TKPM00006为出发菌株,用紫外和氦氖激光结合诱变,通过溴甲酚绿变色指示平板和分别以丁二酸、柠檬酸为唯一碳源的摇瓶初筛得到90株产酸明显的菌株,再经过摇床产量测定,复筛得到1株高产聚苹果酸( PMLA)的菌株.其摇瓶产量为12.62 g/L,较原菌聚苹果酸产量提高了2.97倍.经过传代培养,证明遗传性状稳定.

  14. Masking the Feeling of Being Stupid.

    Science.gov (United States)

    Smith, Sally L.

    1988-01-01

    Teaching experience at The Lab School of Washington has shown that learning-disabled children and adults cope with their lack of self-esteem and feelings of stupidity by developing masks to hide their hurt. These include masks of super-competence, helplessness, invisibility, clowning, injustice collecting, indifference, boredom, outrageousness,…

  15. Masked hypertension, a review of the literature.

    NARCIS (Netherlands)

    Verberk, W.J.; Thien, Th.; Leeuw, P.W. de

    2007-01-01

    Masked hypertension (blood pressure that is normal in the physicians' office but elevated elsewhere) is a common phenomenon as prevalence among studies varies from 8 to 45% and is seen at all ages. large discrepancies, however, exist between studies that have dealt with masked hypertension. It is of

  16. Computing Challenges in Coded Mask Imaging

    Science.gov (United States)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  17. A facial mask comprising Dead Sea mud.

    Science.gov (United States)

    Abu-Jdayil, Basim; Mohameed, Hazim A

    2006-01-01

    Many investigators have proved that Dead Sea salt and mud are useful in treating skin disorders and skin diseases. Therefore, the black mud has been extensively used as a base for the preparation of soaps, creams, and unguents for skin care. This study concerns a facial mask made mainly of Dead Sea mud. The effects of temperature and shearing conditions on the rheological behavior of the facial mask were investigated. The mud facial mask exhibited a shear thinning behavior with a yield stress. It was found that the apparent viscosity of the mask has a strong dependence on the shear rate as well as on the temperature. The facial mask exhibited a maximum yield stress and very shear thinning behavior at 40 degrees C, which is attributed to the gelatinization of the polysaccharide used to stabilize the mud particles. On the other hand, the mud mask exhibited a time-independent behavior at low temperatures and shear rates and changed to a thixotropic behavior upon increasing both the temperature and the shear rate. The shear thinning and thixotropic behaviors have a significant importance in the ability of the facial mask to spread on the skin: the Dead Sea mud mask can break down for easy spreading, and the applied film can gain viscosity instantaneously to resist running. Moreover, particle sedimentation, which in this case would negatively affect consumer acceptance of the product, occurs slowly due to high viscosity at rest conditions.

  18. [Use of respiratory masks in healthcare workers].

    Science.gov (United States)

    Ciotti, C; Bouvet, E; Abiteboul, D

    2008-08-01

    Two different types of filtering respiratory masks are available in healthcare settings. The first ones are used to protect patients from droplets coming from the mouth of healthcare workers (HCW) and the second ones are protective masks. For the moment, we lack information regarding application of Ministry of Health recommendations and on adherence of HCW to mask use. Geres, the HCW exposure risk study group, and the INRS, are now conducting a survey in several hospitals in France to evaluate the use of respiratory masks in healthcare settings. Two phases are planned. Phase I is a self survey using a questionnaire for occupational doctors and hygienists and phase II includes three steps on HCW behavior: evaluation of knowledge and practice concerning respiratory masks, evaluation of respiratory mask use, evaluation of wear and fit test in a context of airborne isolation with a FFP1 and FFP2 respiratory mask. Phase I is finished and phase II is beginning. The first phase I data show that the Ministry's recommendations are observed: respiratory masks are available, written recommendations are present; information and training are organized for healthcare workers. Phase II results are not available yet.

  19. EUV mask pilot line at Intel Corporation

    Science.gov (United States)

    Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

    2004-12-01

    The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

  20. Stop-flow Lithography to Continuously Fabricate Microlens Structures Utilizing an Adjustable Three-Dimensional Mask

    Directory of Open Access Journals (Sweden)

    Shih-Hao Huang

    2014-09-01

    Full Text Available Stop-flow lithography (SFL is a microfluidic-based particle synthesis method, in which photolithography with a two dimensional (2D photomask is performed in situ within a microfluidic environment to fabricate multifunctional microstructures. Here, we modified the SFL technique by utilizing an adjustable electrostatic-force-modulated 3D (EFM-3D mask to continuously fabricate microlens structures for high-throughput production. The adjustable EFM-3D mask contains a layer filled with a UV-absorbing liquid and transparent elastomer structures in the shape of microlenses between two conductive glass substrates. An acrylate oligomer stream is photopolymerized via the microscope projection photolithography, where the EFM-3D mask was set at the field-stop plane of the microscope, thus forming the microlens structures. The produced microlens structures flow downstream without adhesion to the polydimethysiloxane (PDMS microchannel surfaces due to the existence of an oxygen-aided inhibition layer. Microlens structures with variations in curvature and aperture can be produced by changing objective magnifications, controlling the morphology of the EFM-3D mask through electrostatic force, and varying the concentration of UV-light absorption dyes. We have successfully demonstrated to produce microlens structures with an aperture ranging from 50 μm to 2 mm and the smallest focus spot size of 0.59 μm. Our proposed method allows one to fabricate microlens structures in a fast, simple and high-throughput mode for application in micro-optical systems.

  1. Master masks for big patterns by electron-beam lithography

    Science.gov (United States)

    Zlobin, Vladimir A.; Mamonov, V. I.; Vasiljeva, Olga G.

    1995-05-01

    Modern technologies for power semiconductor devices, laser and micro optics, micromechanics requires microlithography of patterns having a large are up to 100 cm2 with complicate precise drawing. The electron beam lithography (EBL) tools with variable shape beam have good prospects for this purpose, but their application has a few problems in case of the tasks pointed above. The main problems are a great volume of information and a large exposure time of such patterns. We propose the system for preparation of the exposure data having more than 100 MB volume that consists from set of personal computers, network adapters, and software. The preparation of graphic information and exposure strategy are presented. The optimum exposure conditions are determined by program modeling the exposure process in dependence on the statistic distribution of sizes of EBL figures. Our method permits to decrease the exposure time in several times under certain conditions and brings that nearer to theoretical limit Tmin equals SD/IBmax, where Tmin is minimum exposure time, S is exposure area, D is dose density, IBmax is maximum beam current. This approach is valid if the basic factor limiting the writing speed is IBmax. The developed computer system and writing strategy was applied us for mask making on modified ZBA-21 tool. These masks were meant for production of power semiconductor and laser optics devices.

  2. Extinction controlled adaptive phase-mask coronagraph

    CERN Document Server

    Bourget, P; Mawet, D; Haguenauer, P

    2012-01-01

    Context. Phase-mask coronagraphy is advantageous in terms of inner working angle and discovery space. It is however still plagued by drawbacks such as sensitivity to tip-tilt errors and chromatism. A nulling stellar coronagraph based on the adaptive phase-mask concept using polarization interferometry is presented in this paper. Aims. Our concept aims at dynamically and achromatically optimizing the nulling efficiency of the coronagraph, making it more immune to fast low-order aberrations (tip-tilt errors, focus, ...). Methods. We performed numerical simulations to demonstrate the value of the proposed method. The active control system will correct for the detrimental effects of image instabilities on the destructive interference. The mask adaptability both in size, phase and amplitude also compensates for manufacturing errors of the mask itself, and potentially for chromatic effects. Liquid-crystal properties are used to provide variable transmission of an annulus around the phase mask, but also to achieve t...

  3. Software-based data path for raster-scanned multi-beam mask lithography

    Science.gov (United States)

    Rajagopalan, Archana; Agarwal, Ankita; Buck, Peter; Geller, Paul; Hamaker, H. Christopher; Rao, Nagswara

    2016-10-01

    According to the 2013 SEMATECH Mask Industry Survey,i roughly half of all photomasks are produced using laser mask pattern generator ("LMPG") lithography. LMPG lithography can be used for all layers at mature technology nodes, and for many non-critical and semi-critical masks at advanced nodes. The extensive use of multi-patterning at the 14-nm node significantly increases the number of critical mask layers, and the transition in wafer lithography from positive tone resist to negative tone resist at the 14-nm design node enables the switch from advanced binary masks back to attenuated phase shifting masks that require second level writes to remove unwanted chrome. LMPG lithography is typically used for second level writes due to its high productivity, absence of charging effects, and versatile non-actinic alignment capability. As multi-patterning use expands from double to triple patterning and beyond, the number of LMPG second level writes increases correspondingly. The desire to reserve the limited capacity of advanced electron beam writers for use when essential is another factor driving the demand for LMPG capacity. The increasing demand for cost-effective productivity has kept most of the laser mask writers ever manufactured running in production, sometimes long past their projected lifespan, and new writers continue to be built based on hardware developed some years ago.ii The data path is a case in point. While state-ofthe- art when first introduced, hardware-based data path systems are difficult to modify or add new features to meet the changing requirements of the market. As data volumes increase, design styles change, and new uses are found for laser writers, it is useful to consider a replacement for this critical subsystem. The availability of low-cost, high-performance, distributed computer systems combined with highly scalable EDA software lends itself well to creating an advanced data path system. EDA software, in routine production today, scales

  4. Triggering and guiding electric discharge by a train of UV picosecond pulses combined with a long UV pulse

    CERN Document Server

    Ionin, A A; Levchenko, A O; Seleznev, L V; Shutov, A V; Sinitsyn, D V; Smetanin, I V; Ustinovsky, N N; Zvorykin, V D

    2012-01-01

    Non-self-sustained electric discharge and electric breakdown were triggered and guided by a train of picosecond UV pulses overlapped with a long free-running UV pulse of a hybrid Ti:Sapphire-KrF laser facility. Photocurrent sustained by this train is two orders of magnitude higher, and electric breakdown distance is twice longer than those for the discharge triggered by the long UV pulse only.

  5. Laser Lithography: Heidelberg DWL-66FS

    Data.gov (United States)

    Federal Laboratory Consortium — Description: CORAL Name: Laser Writer High resolution pattern generator for low volume mask making and direct writing. Specifications / Capabilities: 1x1 to 6x6 inch...

  6. Índice UV

    Science.gov (United States)

    Información general sobre el Índice UV que proporciona un pronóstico del riesgo esperado de sobreexposición a la radiación ultravioleta (UV) del sol. El índice UV va acompañado de recomendaciones para protegerse del sol.

  7. UV fluorescence lidar detection of bioaerosols

    Science.gov (United States)

    Christesen, Steven D.; Merrow, Clifton N.; Desha, Michael S.; Wong, Anna; Wilson, Mark W.; Butler, John C.

    1994-06-01

    A UV fluorescence lidar system for the remote detection of bioaerosols has been built and tested. At the heart of the UV- LIDAR Fluorosensor system are a 200 mJ quadrupled Nd:YAG laser at 266 nm and a 16-inch Cassagrain telescope. Operating on three data collection channels, the UV lidar is capable of real time monitoring of 266 nm elastic backscatter, the total fluorescence between 300 and 400 nm, and the dispersed fluorescence spectrum (using a small spectrograph and gated intensified CCD array). Our goal in this effort was to assess the capabilities of biofluorescence for quantitative detection and discrimination of bioaerosols. To this end, the UV-LIDAR Fluorosensor system was tested against the aerosolized bacterial spore Bacillus subtilus var. niger sp. globiggi (BG) and several likely interferences at several ranges from approximately 600 to 3000 m. Our tests with BG indicate a detection limit of approximately 500 mg/cubic meter at a range of 3000 m.

  8. Study of the radiation X-UV produced during the relativistic interaction between a femtosecond laser and an helium plasma; Etude du rayonnement X-UV produit lors de l'interaction relativiste entre un laser femtoseconde et un plasme d'helium

    Energy Technology Data Exchange (ETDEWEB)

    Ta Phuoc, K

    2002-10-15

    The aim of this work is to design a new source of X-radiation that is both femtosecond and polychromatic. We have studied the Larmor radiation emitted during the relativistic interaction between an intense femtosecond laser and an under dense helium plasma. When the value of a{sub 0}, the laser force parameter, is below 1 and when the interaction is volume is important, the characteristics of the emitted radiation are those of Bremsstrahlung radiation and radiative recombination. When the value of a{sub 0} is about 5 the emitted radiation is strongly different and look like much more the Larmor radiation. Nevertheless some features such as the shape of the angular distribution or the amplitude of the laser polarization effect are not yet well understood. The spectra of the X-ray produced is peaked around 150 eV and spreads up to 2 keV. The number of photons produced by laser shot is over 10{sup 9} and the duration of the X-ray impulse is expected to be in the same order of magnitude as that of the laser impulse: 30 fs. The average photon flux is 2*10{sup 3} ph/s/0.1%BW at 2 keV and reaches 6*10{sup 7} ph/s/0.1%BW at 0.15 keV. The average brilliance is 1.5*10{sup 4} ph/s/mm{sup 2}/mrad{sup 2}/0.1%BW at 2 keV and 8*10{sup 4} ph/s/mm{sup 2}/mrad{sup 2}/0.1%BW at 0.15 keV. Different ways are considered to improve the characteristics of this new X-ray source. (A.C.)

  9. Masking property of quantum random cipher with phase mask encryption

    Science.gov (United States)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  10. Space and time in masking and crowding.

    Science.gov (United States)

    Lev, Maria; Polat, Uri

    2015-01-01

    Masking and crowding are major phenomena associated with contextual modulations, but the relationship between them remains unclear. We have recently shown that crowding is apparent in the fovea when the time available for processing is limited, pointing to the strong relationship between crowding in the spatial and temporal domains. Models of crowding emphasize the size (acuity) of the target and the spacing between the target and flankers as the main determinants that predict crowding. Our model, which is based on lateral interactions, posits that masking and crowding are related in the spatial and temporal domains at the fovea and periphery and that both can be explained by the increasing size of the human perceptive field (PF) with increasing eccentricity. We explored the relations between masking and crowding using letter identification and contrast detection by correlating the crowding effect with the estimated size of the PF and with masking under different spatiotemporal conditions. We found that there is a large variability in PF size and crowding effects across observers. Nevertheless, masking and crowding were both correlated with the estimated size of the PF in the fovea and periphery under a specific range of spatiotemporal parameters. Our results suggest that under certain conditions, crowding and masking share common neural mechanisms that underlie the spatiotemporal properties of these phenomena in both the fovea and periphery. These results could explain the transfer of training gains from spatiotemporal Gabor masking to letter acuity, reading, and reduced crowding.

  11. Intact crowding and temporal masking in dyslexia.

    Science.gov (United States)

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia.

  12. Pupil Masks for Spectrophotometry of Transiting Exoplanets

    Science.gov (United States)

    Itoh, Satoshi; Matsuo, Taro; Goda, Shohei; Shibai, Hiroshi; Sumi, Takahiro

    2017-09-01

    Spectrophotometric stability, which is crucial in the spectral characterization of transiting exoplanets, is affected by photometric variations arising from field-stop loss in space telescopes with pointing jitter or primary mirror deformation. This paper focuses on a new method for removing slit-loss or field-stop-loss photometric variation through the use of a pupil mask. Two types of pupil function are introduced: the first uses conventional (e.g., Gaussian or hyper-Gaussian) apodizing patterns; whereas the second, which we call a block-shaped mask, employs a new type of pupil mask designed for high photometric stability. A methodology for the optimization of a pupil mask for transit observations is also developed. The block-shaped mask can achieve a photometric stability of 10-5 for a nearly arbitrary field-stop radius when the pointing jitter is smaller than approximately 0.7λ /D and a photometric stability of 10-6 at a pointing jitter smaller than approximately 0.5λ /D. The impact of optical aberrations and mask imperfections upon mask performance is also discussed.

  13. Mask industry assessment trend analysis: 2012

    Science.gov (United States)

    Chan, Y. David

    2012-02-01

    Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply among the top critical issues for lithography. A survey was designed by SEMATECH with input from semiconductor company mask technologists and merchant mask suppliers to objectively assess the overall conditions of the mask industry. With the continued support of the industry, this year's assessment was the tenth in the current series of annual reports. This year's survey is basically the same as the 2005 through 2011 surveys. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that ultimately produce a detailed profile of both the business and technical status of the critical mask industry. We received data from 11 companies this year, which was a record high since the beginning of the series. The responding companies represented more than 96% of the volume shipped and about 90% of the 2011 revenue for the photomask industry. These survey reports are often used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. They will continue to serve as a valuable reference to identify strengths and opportunities. Results can also be used to guide future investments in critical path issues.

  14. Neopuff T-piece mask resuscitator: is mask leak related to watching the pressure dial?

    Science.gov (United States)

    Tracy, Mark B; Klimek, J; Shingde, V; Hinder, M; Maheshwari, R; Tracy, S K

    2010-09-01

    The aim of the study is to compare mask leak and delivered ventilation during Neopuff (NP) mask ventilation in two modes: (i) with NP pressure dial hidden and resuscitator watching chest wall (CW) rise with, (ii) CW movement hidden and resuscitator watching NP pressure dial. Thirty-six participants gave mask ventilation to a modified manikin designed to measure mask leak and delivered ventilation for two minutes in each mode randomly assigned. Paired t-tests were used to analyse differences in mean values. Linear regression was used to determine the association of mask leak with delivered ventilation. Of 7277 inflations analysed, 3621 were observing chest wall mode (CWM) and 3656 observing NP mode (NPM). Mask leak was similar between the groups; 31.6% for CWM and 31.5% (p = 0.56) for NPM. There were no significant differences in airways pressures and expired tidal volumes (TVe) between modes. Mask leak was strongly associated with TVe (R = -0.86 p mask leak is not greater when resuscitators watch the NP pressure dial. Mask leak is related to TVe. Mask ventilation training with manikins should include tidal volume measurements. © 2010 The Author(s)/Journal Compilation © 2010 Foundation Acta Paediatrica.

  15. Printed shadow masks for organic transistors

    Science.gov (United States)

    Noguchi, Yoshiaki; Sekitani, Tsuyoshi; Someya, Takao

    2007-09-01

    We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet. After the deposition of the pentacene layer, the shadow mask is peeled off from the base film without any mechanical damages to the lower structures. The mobility in the saturation regime is 0.4cm2/Vs and the on-off ratio exceeds 105.

  16. Tom Pickering as a clinical scientist: masked hypertension.

    Science.gov (United States)

    Eguchi, Kazuo

    2010-04-01

    Masked hypertension has been 'unmasked' by the use of the out-of-office measurement of blood pressure, as home BP monitoring or ambulatory blood pressure monitoring has become available. The term masked hypertension could be used more widely than the original version of masked hypertension; morning hypertension, stress-induced hypertension, and nocturnal hypertension are all classified as subtypes of masked hypertension. Masked hypertension can also be seen in patients with diabetes, that could change clinical practice in diabetes. Masked hypertension is associated with cardiovascular events, but most of the outcome studies are on antihypertensive medications. Therefore, masked hypertension includes insufficient treatment of hypertension. In Dr Pickering's latest review of masked hypertension, prehypertension or high normal blood pressure was stressed as an associating factor with masked hypertension. The biggest theme in the field of hypertension is how we can detect masked hypertension. I present two interesting cases of possible masked hypertension in this commentary.

  17. Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography

    Science.gov (United States)

    Berthod, L.; Vocanson, F.; Langlet, M.; Veillas, C.; Reynaud, S.; Verrier, I.; Laukkanen, J.; Parriaux, O.; Jourlin, Y.

    2016-04-01

    Design and fabrication of a high efficiency phase mask have been performed for printing submicron period gratings along 8 mm diameter glass cylinders. In this article, the authors present the radial phase mask specially designed and manufactured for a cylindrical surface micro-structuring under UV photolithography. Its period is sub-micron (480 nm sol-gel TiO2 thin film layer, enabling direct photo patterning on functionalized layer. The feasibility of a grating printed with a period of Λcylin = 960 nm on an 8 mm diameter cylinder with this dedicated mask has been demonstrated.

  18. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  19. Polishing Your Transparencies: Mounting, Masking, Overlays.

    Science.gov (United States)

    Jobe, Holly; Cannon, Glenn

    This brief guide discusses the mounting of overhead transparencies on frames, the types of mounts, the proper masking for presentation, and the use of overlays. Numerous line drawings provide the reader with a helpful visual reference. (RAO)

  20. Masking of aluminum surface against anodizing

    Science.gov (United States)

    Crawford, G. B.; Thompson, R. E.

    1969-01-01

    Masking material and a thickening agent preserve limited unanodized areas when aluminum surfaces are anodized with chromic acid. For protection of large areas it combines well with a certain self-adhesive plastic tape.

  1. Tailored antireflective biomimetic nanostructures for UV applications

    Energy Technology Data Exchange (ETDEWEB)

    Morhard, Christoph; Pacholski, Claudia; Spatz, Joachim P [Department of New Materials and Biosystems, Max Planck Institute for Metals Research, Heisenbergstrasse 3, D-70569 Stuttgart (Germany); Lehr, Dennis; Brunner, Robert; Helgert, Michael [Carl Zeiss Jena GmbH, Technology Center, Carl-Zeiss-Promenade 10, D-07745 Jena (Germany); Sundermann, Michael, E-mail: Pacholski@mf.mpg.de [Carl Zeiss Jena GmbH, Technology Center, Carl-Zeiss-Strasse 56, D-73447 Oberkochen (Germany)

    2010-10-22

    Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the 'moth eye principle' for reflectance reduction are highly desirable in many optical applications such as solar cells, photodetectors and laser optics. We report an efficient approach for the fabrication of antireflective surfaces based on a two-step process consisting of gold nanoparticle mask generation by micellar block copolymer nanolithography and a multi-step reactive ion etching process. Depending on the RIE process parameters nanostructured surfaces with tailored antireflective properties can easily be fabricated that show optimum performance for specific applications.

  2. Role of mask in asian shamanism

    OpenAIRE

    POVALYASHKO GALINA; ABAYEVA SABINA

    2015-01-01

    In the article there is considered a phenomena of shamanism as a cultural universal. Analysis object is a clay mask of National Museum of the Republic of Kazakhstan. It was found in Keder settlement (Kuiryktobe), located in Otrar Oasis at one of the most busy part of the Silk Road. The mask as shamanistic ritual attribute is considered as an obligatory condition for meditative function of shaman.

  3. No masking between test and mask components in perceptually different depth planes.

    Science.gov (United States)

    Hibbeler, Patrick J; Olzak, Lynn A

    2011-01-01

    2-D cues to perceived depth organization have been used to segregate test and mask stimulus components in a discrimination task. Observers made either spatial-frequency or orientation judgments on a rectangular test component by itself or in the presence of constant rectangular masks. There were two basic masking conditions: same-plane or different-plane. In the same-plane conditions, the test components and masks are perceived as existing in the same depth plane. In the different-plane conditions, the test and mask components are perceived to exist in different depth planes. The perception of different depth planes was achieved by using perceived occlusion, which could place either component closer or further from the observer. The results suggest that when test and mask components are separated into different depth planes they no longer influence one another. This effect could be observed in either depth organization, test components in front of the masks or mask components in front of the test. These results indicate that the figure-ground organization of components is not important. Only the designation as existing in the same or different depth planes affects whether or not a mask is effective.

  4. Masked Uncontrolled Hypertension in CKD.

    Science.gov (United States)

    Agarwal, Rajiv; Pappas, Maria K; Sinha, Arjun D

    2016-03-01

    Masked uncontrolled hypertension (MUCH) is diagnosed in patients treated for hypertension who are normotensive in the clinic but hypertensive outside. In this study of 333 veterans with CKD, we prospectively evaluated the prevalence of MUCH as determined by ambulatory BP monitoring using three definitions of hypertension (daytime hypertension ≥135/85 mmHg; either nighttime hypertension ≥120/70 mmHg or daytime hypertension; and 24-hour hypertension ≥130/80 mmHg) or by home BP monitoring (hypertension ≥135/85 mmHg). The prevalence of MUCH was 26.7% by daytime ambulatory BP, 32.8% by 24-hour ambulatory BP, 56.1% by daytime or night-time ambulatory BP, and 50.8% by home BP. To assess the reproducibility of the diagnosis, we repeated these measurements after 4 weeks. Agreement in MUCH diagnosis by ambulatory BP was 75-78% (κ coefficient for agreement, 0.44-0.51), depending on the definition used. In contrast, home BP showed an agreement of only 63% and a κ coefficient of 0.25. Prevalence of MUCH increased with increasing clinic systolic BP: 2% in the 90-110 mmHg group, 17% in the 110-119 mmHg group, 34% in the 120-129 mmHg group, and 66% in the 130-139 mmHg group. Clinic BP was a good determinant of MUCH (receiver operating characteristic area under the curve 0.82; 95% confidence interval 0.76-0.87). In diagnosing MUCH, home BP was not different from clinic BP. In conclusion, among people with CKD, MUCH is common and reproducible, and should be suspected when clinic BP is in the prehypertensive range. Confirmation of MUCH diagnosis should rely on ambulatory BP monitoring.

  5. Phase mask coronagraphy at JPL and Palomar

    Directory of Open Access Journals (Sweden)

    Serabyn E.

    2011-07-01

    Full Text Available For the imaging of faint companions, phase mask coronagraphy has the dual advantages of a small inner working angle and high throughput. This paper summarizes our recent work in developing phase masks and in demonstrating their capabilities at JPL. Four-quadrant phase masks have been manufactured at JPL by means of both evaporation and etching, and we have been developing liquid crystal vortex phase masks in partnership with a commercial vendor. Both types of mask have been used with our extreme adaptive optics well-corrected subaperture at Palomar to detect known brown dwarf companions as close as ~ 2.5 λ/D to stars. Moreover, our recent vortex masks perform very well in laboratory tests, with a demonstrated infrared contrast of about 10−6 at 3 λ/D, and contrasts of a few 10−7 with an initial optical wavelength device. The demonstrated performance already meets the needs of ground-based extreme adaptive optics coronagraphy, and further planned improvements are aimed at reaching the 10−10 contrast needed for terrestrial exoplanet detection with a space-based coronagraph.

  6. Claude Levi-Strauss: Mask and Myth

    Directory of Open Access Journals (Sweden)

    Senka Kovač

    2016-02-01

    Full Text Available This paper discuss a relationship between mask and myth and how the appropriate analysis by Claude Levi-Strauss may make clearer a complex field of masks in the part of North America. Claude Levi-Strauss stressed the multi- layered character of myth structure. Similar multi-layered character can be seen at the level of expression, content and meaning of Salish, Kwakiutl and other unique masks of this part of North America. Claude Levi-Strauss analysed certain myths trying to explain ‘the path’ of the masks that belong to the people with similar languages, or those who lived nearby. The mythology of Tsimshian, Tlingit and Haïda people have certain common characteristics that point to the similarities with the nearby groups (Kwakiutl. Despite differences that exist at the level of meanings of the masks, there is also common ‘mythological heritage’ of the people who used to live in the Northern Pacific Coast. Claude Levi-Strauss showed that there is no final solution in the myth analysis, and that there is no possibility that the dissection of the problem will reveal some hidden unity. "As mythical though does not want to start clearly somewhere and come somewhere, it never goes through its whole trajectory: there is always something waiting to be fullfield. The same way as rituals, myths are infinite." It seems that Levi-Strauss explanation of the Path of masks goes in that direction.

  7. VSP wave separation by adaptive masking filters

    Science.gov (United States)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  8. Uncertainty and confusion in temporal masking

    Science.gov (United States)

    Formby, C.; Zhang, T.

    2001-05-01

    In a landmark study, Wright et al. [Nature 387, 176-178 (1997)] reported an apparent backward-masking deficit in language-impaired children. Subsequently, these controversial results have been influential in guiding treatments for childhood language problems. In this study we revisited Wright et al.'s temporal-masking paradigm to evaluate listener uncertainty effects. Masked detection was measured for 20-ms sinusoids (480, 1000, or 1680 Hz) presented at temporal positions before, during, or after a gated narrowband (W=600-1400 Hz) masker. Listener uncertainty was investigated by cueing various stimulus temporal properties with a 6000-Hz sinusoid presented either ipsi- or contra-lateral to the test ear or bilaterally. The primary cueing effect was measured in the backward-masking condition for a contralateral cue gated simultaneously with the on-frequency 1000-Hz signal. The resulting cued masked-detection threshold was reduced to quiet threshold. No significant cueing effects were obtained for other signal temporal positions in the masker nor for any off-frequency signal conditions. These results indicate that (1) uncertainty can be reduced or eliminated for on-frequency backward masking by cueing the signal and (2) the deficit reported by Wright et al. for language-impaired children may reflect uncertainty and confusion rather than a temporal-processing deficit per se. [Research supported by NIDCD.

  9. The EGFR family of receptors sensitizes cancer cells towards UV light

    DEFF Research Database (Denmark)

    Petersen, Steffen B.; Neves Petersen, Teresa; Olsen, Birgitte

    2008-01-01

    bridges. The EGF receptor is often overexpressed in cancers and other proliferative skin disorders, it might be possible to significantly reduce the proliferative potential of these cells making them good targets for laser-pulsed UV-light treatment. The discovery that UV light can be used to open......A combination of bioinformatics, biophysical, advanced laser studies and cell biology lead to the realization that laser-pulsed UV light stops cancer growth and induces apoptosis. We have previously shown that laser-pulsed UV (LP-UV) illumination of two different skin-derived cancer cell lines both...... disulphide bridges in proteins upon illumination of nearby aromatic amino acids was the first step that lead to the hypothesis that UV light could modulate the structure and therefore the function of these key receptor proteins. The observation that membrane receptors (EGFR) contained exactly the motifs...

  10. DNA repair. [UV radiation

    Energy Technology Data Exchange (ETDEWEB)

    Setlow, R.

    1978-01-01

    Some topics discussed are as follows: difficulty in extrapolating data from E. coli to mammalian systems; mutations caused by UV-induced changes in DNA; mutants deficient in excision repair; other postreplication mechanisms; kinds of excision repair systems; detection of repair by biochemical or biophysical means; human mutants deficient in repair; mutagenic effects of UV on XP cells; and detection of UV-repair defects among XP individuals. (HLW)

  11. Clean induced feature CD shift of EUV mask

    Science.gov (United States)

    Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

    2016-05-01

    EUV developed in the last decade to the most promising Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber

  12. Optimal Phase Masks for High Contrast Imaging Applications

    Science.gov (United States)

    Ruane, Garreth J.

    2016-05-01

    Phase-only optical elements can provide a number of important functions for high-contrast imaging. This thesis presents analytical and numerical optical design methods for accomplishing specific tasks, the most significant of which is the precise suppression of light from a distant point source. Instruments designed for this purpose are known as coronagraphs. Here, advanced coronagraph designs are presented that offer improved theoretical performance in comparison to the current state-of-the-art. Applications of these systems include the direct imaging and characterization of exoplanets and circumstellar disks with high sensitivity. Several new coronagraph designs are introduced and, in some cases, experimental support is provided. In addition, two novel high-contrast imaging applications are discussed: the measurement of sub-resolution information using coronagraphic optics and the protection of sensors from laser damage. The former is based on experimental measurements of the sensitivity of a coronagraph to source displacement. The latter discussion presents the current state of ongoing theoretical work. Beyond the mentioned applications, the main outcome of this thesis is a generalized theory for the design of optical systems with one of more phase masks that provide precise control of radiation over a large dynamic range, which is relevant in various high-contrast imaging scenarios. The optimal phase masks depend on the necessary tasks, the maximum number of optics, and application specific performance measures. The challenges and future prospects of this work are discussed in detail.

  13. Study on tracheal intubation related severe subglottic stenosis under laryngeal mask by using holmium laser combined with argon plasma coagulation and cryotherapy through bronchoscopy%喉罩下经支气管镜钬激光联合氩气刀和二氧化碳冷冻治疗儿童获得性重度声门下狭窄

    Institute of Scientific and Technical Information of China (English)

    许煊; 祝彬; 石苗茜; 任海丽; 封志纯

    2015-01-01

    目的:探讨2例气管插管相关性重度声门下狭窄喉罩下支气管镜诊断及介入治疗的操作方法、有效性及安全性。方法2例男性患儿,年龄分别为4和11个月,因气管插管后出现脱机困难及呼吸困难,经CT及支气管镜检查,诊断为气管插管相关的重度声门下狭窄,在对家长进行详细告知支气管镜下介入手术不可预知情况并由家长签字同意后,遂对2例患儿进行经喉罩支气管镜下钬激光联合氩气刀和二氧化碳( CO2)冷冻治疗,分析患儿的临床资料、并发症及术后转归、随访情况。结果2例手术过程顺利,例1术后紧贴声门下的肉芽组织被完全清除,2例患儿声门下环形狭窄完全解除,治疗前呼吸道狭窄处周长约2.5 mm,治疗后,周长达5.2 mm,4.0 mm支气管镜进出无障碍,术后气管导管均成功拔除,呼吸困难均明显改善。2例患儿治疗后即刻、7 d、30 d和90 d镜下检查结果示狭窄处开放良好。术中有血氧饱和度下降及心率增快或减慢,暂停操作及恢复给氧后立即恢复,术中及术后未见异常血流动力学改变,2例目前仍在随访中。结论经喉罩钬激光、氩气刀及CO2冷冻治疗可用于后天性肉芽组织增生引起的声门下狭窄,方法安全、有效,近期效果显著,远期仍在进一步随访评估。%Objective To explore the operating methods,the effectiveness and safety for 2 cases of tracheal in-tubation related severe subglottic stenosis under laryngeal mask by using bronchoscopy in the diagnosis and interven-tional treatment. Methods Two male patients ( age at 4 and 11 months) both had difficulty breathing and weaning failure after endotracheal intubation,who were diagnosed with severe subglottic stenosis through CT and bronchoscopy examination. All parents signed their consent after being fully informed of treatment risks. Two cases were treated under bronchoscopic holmium laser combined with argon plasma coagulation and

  14. Ultraviolet laser patterning of porous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Vega, Fidel, E-mail: fvega@oo.upc.edu [Departament d' Òptica i Optometria, UPC, Violinista Vellsolà 37, 08222 Terrasa (Spain); Peláez, Ramón J.; Kuhn, Timo; Afonso, Carmen N. [Laser Processing Group, Instituto de Óptica, CSIC, Serrano 121, 28006 Madrid (Spain); Recio-Sánchez, Gonzalo; Martín-Palma, Raúl J. [Departamento de Física Aplicada, UAM, Campus de Cantoblanco, 28049 Madrid (Spain)

    2014-05-14

    This work reports on the fabrication of 1D fringed patterns on nanostructured porous silicon (nanoPS) layers (563, 372, and 290 nm thick). The patterns are fabricated by phase-mask laser interference using single pulses of an UV excimer laser (193 nm, 20 ns pulse duration). The method is a single-step and flexible approach to produce a large variety of patterns formed by alternate regions of almost untransformed nanoPS and regions where its surface has melted and transformed into Si nanoparticles (NPs). The role of laser fluence (5–80 mJ cm{sup −2}), and pattern period (6.3–16 μm) on pattern features and surface structuring are discussed. The results show that the diameter of Si NPs increases with fluence up to a saturation value of 75 nm for a fluence ≈40 mJ cm{sup −2}. In addition, the percentage of transformed to non-transformed region normalized to the pattern period follows similar fluence dependence regardless the period and thus becomes an excellent control parameter. This dependence is fitted within a thermal model that allows for predicting the in-depth profile of the pattern. The model assumes that transformation occurs whenever the laser-induced temperature increase reaches the melting temperature of nanoPS that has been found to be 0.7 of that of crystalline silicon for a porosity of around 79%. The role of thermal gradients across the pattern is discussed in the light of the experimental results and the calculated temperature profiles, and shows that the contribution of lateral thermal flow to melting is not significant for pattern periods ≥6.3 μm.

  15. Silica-based UV-fibers for DUV applications: current status

    Science.gov (United States)

    Klein, K.-F.; Gonschior, C. P.; Beer, D.; Eckhardt, H.-S.; Belz, M.; Shannon, J.; Khalilov, V.; Klein, M.; Jakob, C.

    2013-05-01

    The current status of UV-damage in several different UV fibers due to defects in their synthetic high-OH silica core and cladding will be described. Further, steps to improve UV resistance and adequate measurement techniques based on a deuterium lamp setup are included. For the first time, the main parameters and their influences on UV induced losses are discussed in detail with an emphasis towards future standardization purposes. Applications based on two new UV light sources, a laser driven xenon plasma broad band source and a high pulse-power 355 nm Nd:YAG laser, are introduced. UV photo-darkening and -bleaching in UV fibers caused by this extremely powerful light source is demonstrated. Finally, first results on transmission of UV light in optical fibers at cryogenic temperatures are shown.

  16. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  17. An etching mask and a method to produce an etching mask

    DEFF Research Database (Denmark)

    2016-01-01

    The present invention relates to an etching mask comprising silicon containing block copolymers produced by self-assembly techniques onto silicon or graphene substrate. Through the use of the etching mask, nanostructures having long linear features having sub-10 nm width can be produced....

  18. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  19. Modelling UV sky for future UV missions

    Science.gov (United States)

    Sreejith, A. G.; Safanova, M.; Mohan, R.; Murthy, Jayant

    Software simulators are now widely used in all areas of science, especially in application to astronomical missions: from instrument design to mission planning, and to data interpretation. We present a simulator to model the diffuse ultraviolet sky, where the different contributors are separately calculated and added together to produce a sky image of the size specified by the instrument requirements. Each of the contributors to the background, instrumental dark current, airglow, zodiacal light and diffuse galactic light, is dependent on various factors. Airglow is dependent on the time of day, zodiacal light on the time of year, angle from the Sun and from the ecliptic, and diffuse UV emission depends on the look direction. To provide a full description of any line of sight, we have also added stars. The diffuse UV background light can dominate in many areas of the sky and severely impact space telescopes viewing directions due to over brightness. The simulator, available as a downloadable package and as a simple web-based tool, can be applied to separate missions and instruments. For demonstration, we present the example used for two UV missions: the UVIT instrument on the Indian ASTROSAT mission to be launched in the next year and a prospective wide-field mission to search for transients in the UV.

  20. Polarisation control of DFB fibre lasers

    DEFF Research Database (Denmark)

    Varming, Poul; Philipsen, Jacob Lundgreen; Berendt, Martin Ole

    1998-01-01

    The polarisation properties of a distributed feedback (DFB) fibre laser are investigated. It is shown experimentally that the birefringence of the UV induced phase-shift is the dominating effect controlling the polarisation properties of the laser......The polarisation properties of a distributed feedback (DFB) fibre laser are investigated. It is shown experimentally that the birefringence of the UV induced phase-shift is the dominating effect controlling the polarisation properties of the laser...

  1. UV-induced effects

    NARCIS (Netherlands)

    Liebsch, M.; Spielmann, H.; Pape, W.; Krul, C.; Deguercy, A.; Eskes, C.A.M.

    2005-01-01

    Regulatory requirements: According to the current Notes for Guidance of the Scientific Committee on Cosmetic Products and Non-Food Products (SCCNFP), cosmetic ingredients and mixtures of ingredients absorbing UV light (in particular UV filter chemicals used, for example, to ensure the light stabilit

  2. UV-induced effects

    NARCIS (Netherlands)

    Liebsch, M.; Spielmann, H.; Pape, W.; Krul, C.; Deguercy, A.; Eskes, C.A.M.

    2005-01-01

    Regulatory requirements: According to the current Notes for Guidance of the Scientific Committee on Cosmetic Products and Non-Food Products (SCCNFP), cosmetic ingredients and mixtures of ingredients absorbing UV light (in particular UV filter chemicals used, for example, to ensure the light

  3. Local growth of aligned carbon nanotubes at surface sites irradiated by pulsed laser

    Science.gov (United States)

    Zimmer, K.; Böhme, R.; Rauschenbach, B.

    2008-05-01

    The utilization of the unique properties of nanostructures often requires their arrangement in mesoscopic patterns, e.g., to facilitate the connection to microelectrodes. Such arrangements can be achieved by local growth of nanostructures. The stimulation of the localized growth of carbon nanotubes (CNT) has been achieved by excimer laser irradiation of iron(III)nitride-coated silicon substrates at a wavelength of 248 nm. After the growth using a thermal CVD process, vertical aligned CNT bundles were found within the laser-irradiated areas. Pulsed UV-laser irradiation causes the transformation of the nitride film into nanoparticles at the substrate surface as AFM measurements show. Surface modification by direct writing techniques allows the growth of arbitrary shaped CNT-forest patterns. Despite the optimization of the processing parameters, an unequal growth of CNT has been observed at the regions of pulse overlap at direct writing. The dissimilar particle properties at the overlap regions are the reason for the different CNT heights. These differences in the catalytic particles properties are caused by the lower laser fluence at the mask edges and the interaction of the laser plasma plume with the pristine nitride film.

  4. X-ray reduction imaging of inclined reflective masks at critical angles

    Science.gov (United States)

    Artyukov, I. A.; Busarov, A. C.; Vinogradov, A. V.; Popov, N. L.

    2016-09-01

    We have proposed and simulated optical schemes for producing reduced images by X-ray lasers or harmonic generators at a wavelength of ~14 nm. The mask in this case is placed at a small angle to the optical axis, corresponding to the angle of total external reflection of the material. We have determined the optimal position of the detector (resist) and the corresponding spatial resolution. The results can be used to solve problems in nanotechnology and nanostructuring of surfaces.

  5. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  6. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  7. OPC aware mask and wafer metrology

    Science.gov (United States)

    Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik M.; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt G.; England, Jonathan G.; Howard, William B.

    2002-08-01

    Lithography at its limit of resolution is a highly non- linear pattern transfer process. Typically the shapes of printed features deviate considerably from their corresponding features in the layout. This deviation is known as Optical Proximity Effect, and its correction Optical Proximity effect Correction or OPC. Although many other so-called optical enhancement technologies are applied to cope with the issues of lithography at its limit of resolution, almost none of these can re-store the linearity of the pattern transfer. Hence fully functional OPC has become a very basic requirement for current and future lithography processes. In general, proximity effects are two-dimensional (2d) effects. Thus any measurement of proximity effects or any characterization of the effectiveness of OPC has to be two- dimensional. As OPC modifies shapes in the data for mask writing in a way to compensate for the expected proximity effects of the following processing steps, parameters describing the particular OPC-mask quality is a major concern. One-dimensional mask specifications, such as linewidth mean-to-target and uniformity, pattern placement, and maximum size of a tolerable defect, are not sufficient anymore to completely describe the functionality of a given mask for OPC. Two-dimensional mask specifications need to be evaluated. We present in this paper a basic concept for 2d metrology. Examples for 2d measurements to assess the effectiveness of OPC are given by the application of an SEM Image Analysis tool to an advanced 130nm process.

  8. Not All Masks Are Created Equal: Masking Success in Clinical Trials of Children and Adolescents.

    Science.gov (United States)

    Jones, Lauren; Black, Sarah R; Arnold, L Eugene; Fristad, Mary A

    2017-07-17

    The current study assessed the success of masking omega-3 (Ω3) and psychotherapy in clinical trials of youth with depression or bipolar spectrum disorder. Participants were youth ages 7-14 with DSM-IV-TR diagnosed depressive (n = 72) or bipolar spectrum (n = 23) disorders. Inclusion diagnoses were depressive disorder, cyclothymic disorder, or bipolar disorder not otherwise specified. Exclusion diagnoses included bipolar I or II disorder, chronic medical condition or autism. Youth participated in 2 × 2 randomized controlled trials, in which they received Ω3 or placebo (PBO) and psychoeducational psychotherapy (PEP) or active monitoring (AM). Participants and study staff (including independent interviewers) were masked to Ω3/PBO allocation. Besides the masked independent interviewers, one coprincipal investigator (Co-PI) was fully masked to both conditions and completed all consensus conference ratings postrandomization. At the endpoint assessment or last completed interview, interviewers and the masked Co-PI guessed whether each child was assigned to Ω3 or PBO and to PEP or AM. Masking failure was calculated using the degree of correct guesses above chance level using binomial tests across all participants for Ω3 versus PBO and PEP versus AM. For all guessers, Ω3 allocation was guessed correctly approximately half the time (50%-52.5%). Rates of correct guessing were higher for PEP, but only the interviewer guesses were correct significantly more often (58.5%-68.7%) than chance. Reporting of masking success should be an essential element of RCTs. Psychotherapy is generally more difficult to mask, but with attentive masking procedures reasonable masking can be achieved.

  9. Ultraviolet laser technology and applications

    CERN Document Server

    Elliott, David L

    1995-01-01

    Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields.The text enables pr

  10. Communication masking in marine mammals: A review and research strategy.

    Science.gov (United States)

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals.

  11. Polymer Masks for nanostructuring of graphene

    DEFF Research Database (Denmark)

    Shvets, Violetta

    This PhD project is a part of Center for Nanostructured Graphene (CNG) activities. The aim of the project is to develop a new lithography method for creation of highly ordered nanostructures with as small as possible feature and period sizes. The method should be applicable for graphene...... polymer masks is developed. Mask fabrication is realized by microtoming of 30-60 nm thin sections from pre-aligned polymer monoliths with different morphologies. The resulting polymer masks are then transferred to both silicon and graphene substrates. Hexagonally packed hole patterns with 10 nm hole...... diameter and 20 nm periodicity are successfully transferred to both substrates. The method allowed to realize the first ever transfer of moiré patterns to silicon. Furthermore, in collaboration with CNG, device with nanostructured graphene are fabricated and electrical measurements made on these devices...

  12. Improved Mask Protected DES using RSA Algorithm

    Directory of Open Access Journals (Sweden)

    Asha Latha S.

    2016-01-01

    Full Text Available The data encryption standard is a pioneering and farsighted standard which helped to set a new paradigm for encryption standards. But now DES is considered to be insecure for some application. Asymmetric mask protected DES is an advanced encryption method for effectively protecting the advanced DES. There are still probabilities to improve its security. This paper propose a method, which introduce a RSA key generation scheme in mask protected DES instead of plain key, which result in enhancement in the security of present asymmetric mask protected DES. We further propose a Vedic mathematical method of RSA implementation which reduce the complexity of computation in RSA block thereby resulting in reduced delay (four timesthat improves the performance of overall system. The software implementation was performed using Xilinx 13.2 and Model-Sim was used for the simulation environment.

  13. Metacontrast masking is processed before grapheme-color synesthesia.

    Science.gov (United States)

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  14. Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making

    Science.gov (United States)

    Yao, Ming-Jiun; Wang, Tzu-Yi; Chen, Chia-Jen; Lee, Hsin-Chang; Ku, Yao-Ching

    2007-05-01

    The mask cost is increasing substantially from generation to generation. Hence, reducing the mask cost is one of the most critical needs in developing a new generation of technology. Compared with variable shaped beam (VSB) e-beam tools, laser writers have the advantage of higher throughput and lower cost. Moreover, the writing time is not dependent on feature count but on the area written. Additionally the FEP-171 resist, which is used for the DUV laser writer, is also the resist used for VSB writers. This enables process sharing and reduces the number of processes needed for mask manufacturing. Finally the laser writer is expected to print Manhattan and X-architecture features with no major differences. Whereas, VSB e-beam tools take longer to write, if X features are included with Manhattan-type features. The inclusion of X features also worsens CD uniformity when written with VSB e-beam tools. The Sigma7500 DUV laser writer uses partially coherent imaging of a spatial light modulator (SLM) to maximize resolution, while providing 4-pass and 2-pass printings, corner enhancement, and grid matching. These functions are evaluated and the results are reported in this paper. Evaluation data shows that the global CD uniformity of dense line/space and isolated spaces is around 6 nm (3σ) for features at 0-, 45-, 90-, and 135-degree angles, which are used in the X architecture. The resolution of lines and spaces can both reach 150 nm. Based on our evaluation, the Sigma7500 can meet both critical 65-nm and sub-critical 45-nm generation mask specifications and reduces the writing cost by 40%. The writing time for X architecture patterns can be reduced by at least a factor of two as compared to VSB systems, while the CD performance remains comparable. However, the pattern fidelity is slightly worse and the CD of 45- and 135-degree lines is difficult to adjust independently. In addition, the Sigma7500 comes with a data-sizing function (ProcessEqualizer) to compensate for

  15. Resonance Enhanced Multi-Photon Ionization (rempi) and Double Resonance Uv-Uv and Ir-Uv Spectroscopic Investigation Isocytosine

    Science.gov (United States)

    Lee, Seung Jun; Min, Ahreum; Ahn, Ahreum; Moon, Cheol Joo; Choi, Myong Yong; Ishiuchi, Shun-Ichi; Miyazaki, Mitsuhiko; Fujii, Masaaki

    2013-06-01

    Isocytosine(iC), 2-aminouracil, is a non-natural nucleobase and its functional group's positions resemble those of guanine; therefore, its spectroscopic investigation is worthy of attention especially for the natural/unnatural base pairs with guanine and isoguanine. In this study, resonance enhanced multi-photon ionization (REMPI) and UV/IR-UV double resonance spectra of iC in the gas phase are presented. The collaboration work between Tokyo Institute of Technology, Japan and Gyeongsang National University, Korea using laser ablation and thermal evaporation, respectively, for producing jet-cooled iC is presented and discussed. The REMPI spectrum of iC monomers is recorded in the spectral range of 35000 to 36400cm-1, showing very congested π-π* vibronic bands. UV-UV hole burning spectroscopy is further conducted to investigate the conformational landscapes of iC monomers. Moreover, the presence of free OH band from IR-UV double resonance spectroscopy in combination with quantum chemical calculations convinces that the iC monomer in free-jet expansion experiment is an enol tautomer. However, a possible presence of a keto tautomer of iC may be provided by employing a pico-second experiment on iC.

  16. Electronic UV dosimeters.

    Science.gov (United States)

    Wulf, H C; Gniadecka, M

    1996-08-01

    The pathogenic role of ultraviolet (UV) in the development of skin cancer, skin ageing and immunosuppression makes it important to monitor human exposure to UV radiation. In a previous study we constructed UVB and UVC dosimeters based on a thermoluminescent phenomenon induced by UV in CaF2 :Dy and CaF2 crystals. However, these dosimeters were insensitive to UVA radiation and readout was time-consuming. In the present study we aimed to develop an electronic dosimeter suitable for UVA, UVB and UVC. The principle of this dosimeter is a measure of accumulated electric current induced by UV on a photodetector. Electric current induced by UV on a photodetector was accumulated in a Plessey's E-cell coulometer. A special reading device was constructed to quantify total charge of the coulometer. Sensitivity for UVA, UVB and UVC was achieved by the use of appropriate filters in front of the photodetector. The sensitivity of the electronic dosimeter increased with increasing wavelength of UV radiation; therefore, in UVB and UVC dosimeters the use of amplifiers was necessary. A linear response to UVA, UVB and UVC was achieved. Dosimeters with a linear response to increasing doses of UVA, UVB and UVC have been constructed for personal monitoring of UV exposure.

  17. Further beyond: registration and overlay control enhancements for optical masks

    Science.gov (United States)

    Gorhad, Kujan; Cohen, Avi; Avizemer, Dan; Dmitriev, Vladimir; Beyer, Dirk; Degel, Wolfgang; Kirsch, Markus

    2014-10-01

    Mask registration control is one of the key performance specifications during the mask qualification process. It is becoming an important factor for yield improvement with the continuously tightening registration specs driven by tight wafer overlay specs. Understanding the impact of miss classified masks on the final wafer yield is gaining more and more attention, especially with the appearance of Multiple Patterning Technologies, where mask to mask overlay effect on wafer is heavily influenced by mask registration. ZEISS has established a promising closed loop solution implemented in the mask house, where the PROVE® system - a highly accurate mask registration and overlay metrology measurement tool, is being used to feed the RegC® - a registration and mask to mask overlay correction tool that can also accurately predict the correction potential in advance. The well-established RegC® process typically reaches 40-70% improvement of the mask registration/overlay error standard deviation. The PROVE® - RegC® closed loop solution has several advantages over alternative registration control methods apart of the mask re-write saving. Among the advantages is the capability to correct for pellicle mounting registration effects without the need to remove the pellicle. This paper will demonstrate improved method for enhanced mask to mask overlay control based on a new scheme of data acquisition and performance validation by the PROVE®. The mask registration data as well as additional mask information will be used to feed the RegC® correction process. Significantly improved mask to mask overlay correction results will be discussed and presented in details.

  18. 车灯面罩涂装工艺%Coating Process of Car Light Mask

    Institute of Scientific and Technical Information of China (English)

    王军

    2012-01-01

    介绍了车灯面罩的材料及涂装要求,详述了车灯面罩紫外线光固化涂装中前处理、喷涂、流平固化等a 艺流程及常见缺陷产生机理,说明了使用清洗剂、涂料、喷枪、治具等的注意事项。%The car light mask coating material and requirements were introduced, the pretreatment, spraying, leveling and curing process and the mechanism of common defect in ear light mask UV curing coating process were introduced in detail, the attention should be eareful in application such as cleaning agent, paint, spray gun, and so on were illustrated.

  19. UV, stress and aging.

    Science.gov (United States)

    Debacq-Chainiaux, Florence; Leduc, Cedric; Verbeke, Alix; Toussaint, Olivier

    2012-07-01

    Skin is a model of choice in studies on aging. Indeed, skin aging can be modulated by internal and external factors, reflecting its complexity. Two types of skin aging have been identified: intrinsic, mainly genetically determined and extrinsic-also called "photo-aging"-resulting on the impact of environmental stress and more precisely of UV rays. Simplified in vitro models, based on cellular senescence, have been developed to study the relationship between UV and aging. These models vary on the cell type (fibroblasts or keratinocytes, normal or immortalized) and the type of UV used (UVA or UVB).

  20. Predicting UV sky for future UV missions

    Science.gov (United States)

    Safonova, M.; Mohan, R.; Sreejith, A. G.; Murthy, Jayant

    2013-02-01

    Software simulators are now widely used in all areas of science, especially in application to astronomical missions: from instrument design to mission planning, and to data interpretation. We present a simulator to model the diffuse ultraviolet sky, where the different contributors are separately calculated and added together to produce a sky image of the size specified by the instrument requirements. Each of the contributors to the background, instrumental dark current, airglow, zodiacal light and diffuse Galactic light, depends on different factors. Airglow is dependent on the time of day; zodiacal light depends on the time of year, angle from the Sun and from the ecliptic; diffuse UV emission depends on the line of sight. To provide a full description of the sky along any line of sight, we have also added stars. The UV background light can dominate in many areas of the sky and severely limit viewing directions due to overbrightness. The simulator, available as a downloadable package and as a web-based tool, can be applied to preparation of real space missions and instruments. For demonstration, we present the example use for the two near-future UV missions: UVIT instrument on the Indian Astrosat mission and a new proposed wide-field (∼1000 square degrees) transient explorer satellite.

  1. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  2. Advances in mask fabrication and alignment for masked ion-beam lithography

    Science.gov (United States)

    Stumbo, David P.; Damm, George A.; Engler, D. W.; Fong, F. O.; Sen, S.; Wolfe, John C.; Randall, John N.; Mauger, Phillip E.; Shimkunas, Alex R.; Loeschne, Hans

    1990-05-01

    This paper describes recent developments in three areas ofmasked ion beam lithography (MIBL). These are 1) fabrication oflarge area, low distortion, silicon stencilmasks for demagnifying ion projection lithography, 2) fabrication ofstencil masks with nanometer scale resolution for 1:1 proximity printing, and 3) development of a direct method of alignment using the ion beam induced fluorescence of Si02. These topics are discussed below. Demagnifying ion projection masks: We describe the fabrication of stencil masks in large area, low stress (10 MPa), n-type silicon membranes. The projection masks have a silicon foil area 95 mm in diameter, thicknesses between 1.5-5 and resolution of0.6um. Measured distortion (3a) in the IPL masks ranges between 0.23gm and 0.65,um, with an experimental error of 0.20 1um. Proximity printing masks: A process is described for fabricating stencil masks with 50 nm resolution in low stress, n-type silicon membranes. Membranes less than 0.5 ,ttm thick are shown to be free of the sidewall taper that limits resolution in thicker masks. These thin membranes show a slightly flared profile due to the imperfectly collimated etching ions. Alignment: A direct method of alignment is being developed which uses the ion beam induced fluorescence of Si02 marks. Fluorescence yield is characterized as a function of ion energy and resist coating thickness. The yield for Si02 is in the range between 0.1-1.0 photons/proton, while the yields for Si, Al, and photoresist are negligibly small. Thus, a simple alignment technique can be implemented where registration of a grating in the mask with a corresponding oxide pattern is detected as a fluorescence maximum. A simple model predicts that 50 nm alignment can be accomplished, following a 1 im prealignment, in 2 seconds.

  3. Cosmic Ballet or Devil's Mask?

    Science.gov (United States)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  4. Coupled optical resonance laser locking.

    Science.gov (United States)

    Burd, S C; du Toit, P J W; Uys, H

    2014-10-20

    We have demonstrated simultaneous laser frequency stabilization of a UV and IR laser, to coupled transitions of ions in the same spectroscopic sample, by detecting only the absorption of the UV laser. Separate signals for locking the different lasers are obtained by modulating each laser at a different frequency and using lock-in detection of a single photodiode signal. Experimentally, we simultaneously lock a 369 nm and a 935 nm laser to the (2)S(1/2) → (2)(P(1/2) and (2)D(3/2) → (3)D([3/2]1/2) transitions, respectively, of Yb(+) ions generated in a hollow cathode discharge lamp. Stabilized lasers at these frequencies are required for cooling and trapping Yb(+) ions, used in quantum information and in high precision metrology experiments. This technique should be readily applicable to other ion and neutral atom systems requiring multiple stabilized lasers.

  5. Reviews Equipment: Chameleon Nano Flakes Book: Requiem for a Species Equipment: Laser Sound System Equipment: EasySense VISION Equipment: UV Flash Kit Book: The Demon-Haunted World Book: Nonsense on Stilts Book: How to Think about Weird Things Web Watch

    Science.gov (United States)

    2011-03-01

    WE RECOMMEND Requiem for a Species This book delivers a sober message about climate change Laser Sound System Sound kit is useful for laser demonstrations EasySense VISION Data Harvest produces another easy-to-use data logger UV Flash Kit Useful equipment captures shadows on film The Demon-Haunted World World-famous astronomer attacks pseudoscience in this book Nonsense on Stilts A thought-provoking analysis of hard and soft sciences How to Think about Weird Things This book explores the credibility of astrologers and their ilk WORTH A LOOK Chameleon Nano Flakes Product lacks good instructions and guidelines WEB WATCH Amateur scientists help out researchers with a variety of online projects

  6. UV and EUV Instruments

    CERN Document Server

    Werner, K

    2010-01-01

    We describe telescopes and instruments that were developed and used for astronomical research in the ultraviolet (UV) and extreme ultraviolet (EUV) regions of the electromagnetic spectrum. The wavelength ranges covered by these bands are not uniquely defined. We use the following convention here: The EUV and UV span the regions ~100-912 and 912-3000 Angstroem respectively. The limitation between both ranges is a natural choice, because the hydrogen Lyman absorption edge is located at 912 Angstroem. At smaller wavelengths, astronomical sources are strongly absorbed by the interstellar medium. It also marks a technical limit, because telescopes and instruments are of different design. In the EUV range, the technology is strongly related to that utilized in X-ray astronomy, while in the UV range the instruments in many cases have their roots in optical astronomy. We will, therefore, describe the UV and EUV instruments in appropriate conciseness and refer to the respective chapters of this volume for more technic...

  7. Adaptation to different noninvasive ventilation masks in critically ill patients

    Directory of Open Access Journals (Sweden)

    Renata Matos da Silva

    2013-06-01

    Full Text Available OBJECTIVE: To identify which noninvasive ventilation (NIV masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%. Total face masks were the most commonly used (in 74.7%, followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively. Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

  8. A new approach for defect inspection on large area masks

    Science.gov (United States)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  9. UV, stress and aging

    OpenAIRE

    Debacq-Chainiaux, Florence; Leduc, Cedric; Verbeke, Alix; Toussaint, Olivier

    2014-01-01

    Skin is a model of choice in studies on aging. Indeed, skin aging can be modulated by internal and external factors, reflecting its complexity. Two types of skin aging have been identified: intrinsic, mainly genetically determined and extrinsic—also called "photo-aging"—resulting on the impact of environmental stress and more precisely of UV rays. Simplified in vitro models, based on cellular senescence, have been developed to study the relationship between UV and aging. These models vary on ...

  10. Defect printability in CPL mask technology

    Science.gov (United States)

    Kuijten, Jan-Pieter; Verhappen, Arjan; Pijnenburg, Wil; Conley, Will; Litt, Lloyd C.; Wu, Wei; Montgomery, Patrick; Roman, Bernard J.; Kasprowicz, Bryan S.; Progler, Christopher J.; Socha, Robert J.; Van Den Broeke, Douglas J.; Schaefer, Erika; Cook, Pat

    2004-05-01

    Each generation of semiconductor device technology drive new and interesting resolution enhancement technology (RET"s). The race to smaller and smaller geometry"s has forced device manufacturers to k1"s approaching 0.40. The authors have been investigating the use of Chromeless phase-shifting masks (CPL) exposed with ArF, high numerical aperture (NA), and off-axis illumination (OAI) has been shown to produce production worthy sub-100nm resist patterns with acceptable overlapped process window across feature pitch. These new reticle technologies have many issues that are similar to simple binary masks. The authors have investigated the printability of defects in CPL mask technology. Programmed defects of various sizes and types have been simulated and printed for sub 100nm imaging. High resolution scanning electron microscopy has been used to characterize these defects and develop an understanding of size and type that prints. In this paper the authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. The authors have built a number of test structures that require superior 2D control for SRAM gate structures. Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds.

  11. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  12. The fastest saccadic responses escape visual masking.

    Directory of Open Access Journals (Sweden)

    Sébastien M Crouzet

    Full Text Available Object-substitution masking (OSM occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. The reduction of target visibility occurring after OSM has been suggested to result from a specific interference with reentrant visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task, which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference under either OSM or backward masking, as they did under the low-contrast condition. This finding supports the hypothesis that masking interferes mostly with reentrant processing at later stages, while leaving early feedforward processing largely intact.

  13. The laryngeal mask airway at altitude.

    Science.gov (United States)

    Wilson, Grant D; Sittig, Steven E; Schears, Gregory J

    2008-02-01

    The Laryngeal Mask Airway (LMA) is an accepted adjunct for airway management in emergency patients. There are a number of case reports describing its use in transport medicine for infant to adult patients, including during flight. Although studies of the effect altitude has on air-filled tracheal tubes exists, we were unable to find documentation of the effect of altitude on laryngeal mask airways. Our objective was to assess the effect of altitude on the LMA in both fixed wing and rotary wing models. We performed an in vitro study of the effect of altitude on the LMA cuff. Infant and adult airway trainer mannequins with properly sized and inserted LMA-Classic laryngeal mask airways were monitored for cuff pressure changes while flown at altitudes commonly encountered during air medical transport. Both models demonstrated that LMA cuff pressures may exceed manufacturer recommended levels for safe use even at the relatively low altitudes experienced during rotor wing flight. Properly inserted and inflated laryngeal mask airways at ground level may result in overinflated LMA cuffs when flown to altitudes commonly used for rotor and fixed wing medical transport unless monitored and corrected.

  14. Posleslovije k "Zolotoi maske" / Boris Tuch

    Index Scriptorium Estoniae

    Tuch, Boris, 1946-

    2005-01-01

    Vene draamafestivali "Kuldne mask Eestis" lavastusest : "September.doc", lav. Mihhail Ugarov, I. Võrõpajevi "Hapnik" lav. Viktor Rõzhakov Teatr.doc esituses, Sophoklese "Kuningas Oidipus" lav. Andrei Prikotenko Peterburi Teatri Liteinõi esituses, M. Ugarovi lavastus "OblomOFF"

  15. Testing Tactile Masking between the Forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2016-02-10

    Masking, in which one stimulus affects the detection of another, is a classic technique that has been used in visual, auditory, and tactile research, usually using stimuli that are close together to reveal local interactions. Masking effects have also been demonstrated in which a tactile stimulus alters the perception of a touch at a distant location. Such effects can provide insight into how components of the body's representations in the brain may be linked. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at corresponding contralateral locations. To explore the matching of corresponding points across the body, we can measure the spatial tuning and effect of posture on contralateral masking. Careful controls are required to rule out direct effects of the remote stimulus, for example by mechanical transmission, and also attention effects in which thresholds may be altered by the participant's attention being drawn away from the stimulus of interest. The use of this technique is beneficial as a behavioural measure for exploring which parts of the body are functionally connected and whether the two sides of the body interact in a somatotopic representation. This manuscript describes a behavioural protocol that can be used for studying contralateral tactile masking.

  16. Chromium Contamination in Army Face Masks.

    Science.gov (United States)

    1989-01-01

    containing carbon particles by inhalation when wearing face masks. Other potential health effects are chrome allergies and nonneoplastic lesions of...chronic inflammation—have been reported in chrome -platers and other workers exposed to aerosols of chromium (VI) compounds. Chronic pharyngitis...monochromates and dichromates of sodium, potassium , ammonium, lithium, cesium, and rubidium. ACGIH includes chromium in its list of known human

  17. TASTE MASKING IN PHARMACEUTICAL: AN UPDATE

    Directory of Open Access Journals (Sweden)

    Srivastava Saurabh

    2012-08-01

    Full Text Available Taste is an important factor in the development of dosage form. Nevertheless it is that arena of product development that has been overlooked and undermined for its importance. The problem of bitter and obnoxious taste of is a challenge to the pharmacist in the present scenario. Taste is an important parameter governing compliance. Several oral pharmaceuticals and bulking agents have unpleasant, bitter-tasting components. In numerous cases, the bitter taste modality is an undesirable trait of the product or formulations and can considerably affect its acceptability by consumers. Bitter characteristics found in such systems have been eliminated or minimized by various known processes, but no universally applicable technology for bitterness inhibition has ever been recognized. The desire of improved palatability in these products has prompted the development of numerous formulations with improved performance and acceptability Taste masking technologies offer a great scope for invention and patents. Several approaches like adding flavors and sweeteners, use of coating polymers for inhibiting bitterness, microencapsulation, prodrug formation, formation of inclusion and molecular complexes, solid dispersion system, addition of effervescent agents and application of ion exchange resins have been tried by the formulators to mask the unpleasant taste of the bitter drugs. The present review attempts to give a brief account of different technologies of taste masking with respect to dosage form and novel methods of evaluation of taste masking effect.

  18. Mask cycle time reduction for foundry projects

    Science.gov (United States)

    Balasinski, A.

    2011-11-01

    One of key deliverables of foundry based manufacturing is low cycletime. Building new and enhancing existing products by mask changes involves significant logistical effort, which could be reduced by standardizing data management and communication procedures among design house, mask shop, and foundry (fab) [1]. As an example, a typical process of taping out can take up to two weeks in addition to technical effort, for database handling, mask form completion, management approval, PO signoff and JDV review, translating into loss of revenue. In order to reduce this delay, we are proposing to develop a unified online system which should assist with the following functions: database edits, final verifications, document approvals, mask order entries, and JDV review with engineering signoff as required. This would help a growing number of semiconductor products to be flexibly manufactured at different manufacturing sites. We discuss how the data architecture based on a non-relational database management system (NRDMBS) extracted into a relational one (RDMBS) should provide quality information [2], to reduce cycle time significantly beyond 70% for an example 2 week tapeout schedule.

  19. Masked object registration in the Fourier domain.

    Science.gov (United States)

    Padfield, Dirk

    2012-05-01

    Registration is one of the most common tasks of image analysis and computer vision applications. The requirements of most registration algorithms include large capture range and fast computation so that the algorithms are robust to different scenarios and can be computed in a reasonable amount of time. For these purposes, registration in the Fourier domain using normalized cross-correlation is well suited and has been extensively studied in the literature. Another common requirement is masking, which is necessary for applications where certain regions of the image that would adversely affect the registration result should be ignored. To address these requirements, we have derived a mathematical model that describes an exact form for embedding the masking step fully into the Fourier domain so that all steps of translation registration can be computed efficiently using Fast Fourier Transforms. We provide algorithms and implementation details that demonstrate the correctness of our derivations. We also demonstrate how this masked FFT registration approach can be applied to improve the Fourier-Mellin algorithm that calculates translation, rotation, and scale in the Fourier domain. We demonstrate the computational efficiency, advantages, and correctness of our algorithm on a number of images from real-world applications. Our framework enables fast, global, parameter-free registration of images with masked regions.

  20. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at