WorldWideScience

Sample records for m17a2 gas mask

  1. Contact urticaria to the MCU-2A/P gas mask.

    Science.gov (United States)

    Elmer, K B; George, R M

    1999-05-01

    A case of contact urticaria to the silicone rubber in the MCU-2A/P gas mask is presented. Contact urticaria is a type I hypersensitivity reaction mediated by immunoglobulin E that usually manifests as localized erythema, edema, pruritus, and urticarial plaques. It can also cause systemic reactions, including anaphylaxis. Allergic reactions to silicone rubber have been increasingly reported and are of importance in medical and military personnel. The implication of such a diagnosis in an active duty military member is significant because the individual cannot be worldwide-qualified. The correct diagnosis of allergic skin reactions to personal protective gear is critical to maintaining a strong fighting force and protecting military personnel from potentially life-threatening allergic reactions.

  2. Airway obstruction and gas leak during mask ventilation of preterm infants in the delivery room.

    LENUS (Irish Health Repository)

    2011-07-01

    Preterm infants with inadequate breathing receive positive pressure ventilation (PPV) by mask with variable success. The authors examined recordings of PPV given to preterm infants in the delivery room for prevalence of mask leak and airway obstruction.

  3. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  4. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  5. The role of ventilation mode using a laryngeal mask airway during gynecological laparoscopy on lung mechanics, hemodynamic response and blood gas analysis.

    Science.gov (United States)

    Jarahzadeh, Mohammad Hossein; Halvaei, Iman; Rahimi-Bashar, Farshid; Behdad, Shekoufeh; Abbasizadeh Nasrabady, Rouhollah; Yasaei, Elahe

    2016-12-01

    There are two methods for ventilation in gynecological laparoscopy: volume-controlled ventilation (VCV) and pressure-controlled ventilation (PCV). To compare the lung mechanics, hemodynamic response and arterial blood gas analysis and gas exchange of two modes of VCV and PCV using laryngeal mask airway (LMA) at different time intervals. Sixty infertile women referred for diagnostic laparoscopy, based on ventilation mode, were randomly divided into two groups of VCV (tidal volume: 10 ml/kg) and PCV. In the PCV group, ventilation was initiated with a peak airway pressure (tidal volume: 10 ml/kg, upper limit: 35 cm H2O). In both groups, the arterial blood samples were taken in several time intervals (5, 10 and 15 min after LMA insertion) for blood gas evaluation. Also the lung mechanics parameters were continuously monitored and were recorded at different time intervals. There were no significant differences for patient's age, weight, height and BMI in two groups. The peak and plateau airway pressure were significantly higher in VCV group compared to PCV group 5 and 10 min after insertion of LMA. PaO2 was significantly higher after 10 and 15 min in VCV group compared to PCV group (p=0.005 and p=0.03, respectively). PaCO2 showed significant increase after 5 min in PCV group, but the differences were not significant after 10 and 15 min in two groups. The end tidal CO2 showed significant increase after 10 and 15 min in VCV compared to PCV group. Both VCV and PCV seem to be suitable for gynecological laparoscopy. However, airway pressures are significantly lower in PCV compared to VCV.

  6. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  7. Mask degradation monitoring with aerial mask inspector

    Science.gov (United States)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  8. Mask industry assessment: 2004

    Science.gov (United States)

    Shelden, Gilbert V.; Hector, Scott D.

    2004-12-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the third in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey builds upon the 2003 survey to provide an ongoing database using the same questions as a baseline with only a few minor changes or additions. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from ten major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

  9. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  10. Analyzing EUV mask costs

    Science.gov (United States)

    Lercel, Michael; Kasprowicz, Bryan

    2016-10-01

    The introduction of Extreme Ultraviolet Lithography (EUV) as a replacement for multiple patterning is based on improvements of cycle time, yield, and cost. Earlier cost studies have assumed a simple assumption that EUV masks (being more complex with the multilayer coated blank) are not more than three times as expensive as advanced ArFi (ArF immersion) masks. EUV masks are expected to be more expensive during the ramp of the technology because of the added cost of the complex mask blank, the use of EUV specific mask tools, and a ramp of yield learning relative to the more mature technologies. This study concludes that, within a range of scenarios, the hypothesis that EUV mask costs are not more than three times that of advanced ArFi masks is valid and conservative.

  11. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime...... mask using a directional system and a method for correcting errors in the target binary mask. The last part of the thesis, proposes a new method for objective evaluation of speech intelligibility....

  12. Mask industry assessment: 2003

    Science.gov (United States)

    Kimmel, Kurt R.

    2003-12-01

    Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was initiated in 2002 with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition.1 This paper presents the results of the second annual survey which is an enhanced version of the inaugural survey building upon its strengths and improving the weak points. The original survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. The assessment is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the critical mask industry. An objective is to create a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. As subsequent years are added, historical profiles can also be created. This assessment includes inputs from ten major global merchant and captive mask manufacturers representing approximately 80% of the global mask market (using revenue as the measure) and making this the most comprehensive mask industry survey ever. The participating companies are: Compugraphics, Dai Nippon Printing, Dupont Photomask, Hoya, IBM, Infineon, Intel, Taiwan Mask Company, Toppan, and TSMC. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the mask industry.

  13. Binary mask programmable hologram.

    Science.gov (United States)

    Tsang, P W M; Poon, T-C; Zhou, Changhe; Cheung, K W K

    2012-11-19

    We report, for the first time, the concept and generation of a novel Fresnel hologram called the digital binary mask programmable hologram (BMPH). A BMPH is comprised of a static, high resolution binary grating that is overlaid with a lower resolution binary mask. The reconstructed image of the BMPH can be programmed to approximate a target image (including both intensity and depth information) by configuring the pattern of the binary mask with a simple genetic algorithm (SGA). As the low resolution binary mask can be realized with less stringent display technology, our method enables the development of simple and economical holographic video display.

  14. Mask industry assessment: 2005

    Science.gov (United States)

    Shelden, Gilbert; Hector, Scott

    2005-11-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the fourth in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey contains all of the 2004 survey questions to provide an ongoing database. Additional questions were added to the survey covering operating cost factors and equipment utilization. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors and equipment utilization. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market. This participation rate is reduced by one captive from 2004. Note: Toppan, DuPont Photomasks Inc and AMTC (new) were consolidated into one input therefore the 2004 and 2005 surveys are basically equivalent.

  15. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  16. Gender difference in mask ventilation training of anesthesia residents.

    Science.gov (United States)

    Koga, Tomomichi; Kawamoto, Masashi

    2009-05-01

    To investigate whether gender difference has an effect on an anesthesia resident's ability to perform successful mask ventilation. Cohort study. Surgical operation theater of a university-affiliated hospital. 839 ASA physical status I, II, and III patients undergoing general anesthesia performed by residents. Mask ventilation was performed by 21 different anesthesia residents. Difficult mask ventilation was defined as the inability of an unassisted resident to maintain oxygen saturation, significant gas flow leakage beneath the face mask, need to increase gas flow, no perceptible chest movement, assistance required using a two-handed mask ventilation technique, or use of the oxygen flush valve more than twice. Instances of difficult mask ventilation were observed in 210 patients (25.0%), though all were adequately ventilated with a face mask. Difficult mask ventilation was observed significantly more often with female (29.8%) than male (20.0%) residents. Residents' gender was shown to be an independent risk factor for difficult mask ventilation. Gender difference has an effect on the mask ventilation learning process, as it was more difficult for female residents to provide a tight air seal in the early stage of training.

  17. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  18. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  19. Gilded Silver Mask

    Institute of Scientific and Technical Information of China (English)

    1998-01-01

    This gilded silver mask from the Liao Dynasty is 31 cm long and 22.2 cm wide. The plump oval face was designed with a protruding brow ridge, narrow eyes, high-bridged nose and closed mouth. The chin is slightly round against a thin neck, the ears are long and the hair can be clearly seen from the finely carved lines. The use of masks was recorded as

  20. New mask technology challenges

    Science.gov (United States)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  1. Mask Blank Defect Detection

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask

  2. Overview of Mask Metrology

    Science.gov (United States)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  3. [The laryngeal mask].

    Science.gov (United States)

    Poltroniéri, J

    1990-01-01

    A new type of airway has been widely used for two years, throughout hospitals in the United Kingdom. Designed and created since 1983 by Dr AIJ Brain, the Laryngeal Mask Airway (LMA) is a compromise between the endotracheal tube and the face-mask. Blindly inserted in an anaesthetized patient, without either a laryngoscope or neuromuscular blockade, it provides a good airway in almost all cases. It is often able to offer an effective alternative to difficult intubation. The LMA can be used with either spontaneous or positive pressure ventilation. Because it doesn't provide a reliable protection of the airway from aspiration, it should never be used in the patient with a full stomach. The spontaneously breathing patient, undergoing elective surgery for 15 to 60 minutes, in supine position, who would ordinarily be managed with a face-mask is the more likely candidate for the LMA. But, longer procedures, in lateral or prone position, with controlled ventilation can usually be carried out using the Brain's device. More effective and less demanding than the facial-mask, much less hurtful than the endotracheal tube, the Laryngeal Mask is potentially an important and valuable addition to anaesthetic care.

  4. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  5. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  6. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  7. Masked mycotoxins: a review.

    Science.gov (United States)

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders.

  8. CADAT integrated circuit mask analysis

    Science.gov (United States)

    1981-01-01

    CADAT System Mask Analysis Program (MAPS2) is automated software tool for analyzing integrated-circuit mask design. Included in MAPS2 functions are artwork verification, device identification, nodal analysis, capacitance calculation, and logic equation generation.

  9. The VIRMOS mask manufacturing tools; 2, Mask manufacturing and handling

    CERN Document Server

    Conti, G; Mattaini, E; MacCagni, D; Lefèvre, O; Saisse, M; Vettolani, G

    1999-01-01

    We describe the VIRMOS Mask Manufacturing Unit (MMU) configuration, composed of two units:the Mask Manufacturing Machine (with its Control Unit) and the Mask Handling Unit (inclusive of Control Unit, Storage Cabinets and robot for loading of the Instrument Cabinets). For both VIMOS and NIRMOS instruments, on the basis of orders received by the Mask Preparation Software (see paper (a) in same proceedings), the function of the MMU is to perform an off-line mask cutting and identification, followed by mask storing and subsequent filling of the Instrument Cabinets (IC). We describe the characteristics of the LPKF laser cutting machine and the work done to support the choice of this equipment. We also describe the remaining of the hardware configuration and the Mask Handling Software.

  10. Mask industry quality assessment

    Science.gov (United States)

    Strott, Al; Bassist, Larry

    1994-12-01

    Product quality and timely delivery are two of the most important parameters in determining the success of a mask manufacturing facility. Because of the sensitivity of this data, very little was known about industry performance in these areas until an assessment was authored and presented at the 1993 BACUS Symposium by Larry Regis of Intel Corporation, Neil Paulsen of Intel Corporation, and James A. Reynolds of Reynolds Consulting. This data has been updated and will be published and presented at this year's BACUS Symposium. Contributor identities will again remain protected by utilizing Arthur Andersen & Company to compile the submittals. Participation was consistent with last year's representation of over 75% of the total merchant and captive mask volume in the United States. The data compiled includes shipments, customer return rate, customer return reasons from 1988 through Q2, 1994, performance to schedule, plate survival yield, and throughput time (TPT).

  11. Masked multichannel analyzer

    Science.gov (United States)

    Winiecki, A.L.; Kroop, D.C.; McGee, M.K.; Lenkszus, F.R.

    1984-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  12. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  13. BIRD FLU MASKS

    Directory of Open Access Journals (Sweden)

    YASAR KESKIN

    2006-08-01

    Full Text Available Avian influenza (bird flu is a disease of birds caused by influenza viruses closely related to human influenza viruses. The potential for transformation of avian influenza into a form that both causes severe disease in humans and spreads easily from person to person is a great concern for world health. The main purpose of a mask is to help prevent particles (droplets being expelled into the environment by the wearer. Masks are also resistant to fluids, and help protect the wearer from splashes of blood or other potentially infectious substances. They are not necessarily designed for filtration efficiency, or to seal tightly to the face. Masks and respirators are components of a number of infection control measures intended to protect healthcare workers, and prevent the spread of diseases. All healthcare workers who come into contact with a possible or probable case of any respiratory track infections should wear a respirator conforming to at least EN149:2001 FFP3. [TAF Prev Med Bull 2006; 5(4.000: 296-306

  14. Mask alignment system for semiconductor processing

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.; Grant, Christopher N.

    2017-02-14

    A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

  15. Assessing EUV mask defectivity

    Science.gov (United States)

    Okoroanyanwu, Uzodinma; Tchikoulaeva, Anna; Ackmann, Paul; Wood, Obert; La Fontaine, Bruno; Bubke, Karsten; Holfeld, Christian; Peters, Jan Hendrik; Kini, Sumanth; Watson, Sterling; Lee, Isaac; Mu, Bo; Lim, Phillip; Raghunathan, Sudhar; Boye, Carol

    2010-04-01

    This paper assesses the readiness of EUV masks for pilot line production. The printability of well characterized reticle defects, with particular emphasis on those reticle defects that cause electrical errors on wafer test chips, is investigated. The reticles are equipped with test marks that are inspected in a die-to-die mode (using DUV inspection tool) and reviewed (using a SEM tool), and which also comprise electrically testable patterns. The reticles have three modules comprising features with 32 nm ground rules in 104 nm pitch, 22 nm ground rules with 80 nm pitch, and 16 nm ground rules with 56 nm pitch (on the wafer scale). In order to determine whether specific defects originate from the substrate, the multilayer film, the absorber stack, or from the patterning process, the reticles were inspected after each fabrication step. Following fabrication, the reticles were used to print wafers on a 0.25 NA full-field ASML EUV exposure tool. The printed wafers were inspected with state of the art bright-field and Deep UV inspection tools. It is observed that the printability of EUV mask defects down to a pitch of 56 nm shows a trend of increased printability as the pitch of the printed pattern gets smaller - a well established trend at larger pitches of 80 nm and 104 nm, respectively. The sensitivity of state-of-the-art reticle inspection tools is greatly improved over that of the previous generation of tools. There appears to be no apparent decline in the sensitivity of these state-of-the-art reticle inspection tools for higher density (smaller) patterns on the mask, even down to 56nm pitch (1x). Preliminary results indicate that a blank defect density of the order of 0.25 defects/cm2 can support very early learning on EUV pilot line production at the 16nm node.

  16. Trends in mask data preparation

    Science.gov (United States)

    Fujimura, Aki; Pang, Liyong; Su, Bo; Choi, Yohan

    2014-10-01

    Whether for VSB mask writing or for multibeam mask writing, the shapes we need to write on masks are increasingly complex, increasingly curvilinear, and smaller in minimum width and space. The overwhelming trend in mask data preparation (MDP) is the shift from deterministic, rule-based, geometric, context-independent, shape-modulated, rectangular processing to statistical, simulation-based, context-dependent, dose- and shape-modulated any-shape processing. The paper briefly surveys the history of MDP, and explains through a simulation-based study that 50nm line and space is the tipping point where rule-based processing gives away to simulation-based processing.

  17. Masked hypertension: a systematic review.

    Science.gov (United States)

    Bobrie, Guillaume; Clerson, Pierre; Ménard, Joël; Postel-Vinay, Nicolas; Chatellier, Gilles; Plouin, Pierre-François

    2008-09-01

    The purpose of this research was to review the literature on masked hypertension. Studies, reviews and editorials on masked hypertension were identified by PubMed, Pascal BioMed and Cochrane literature systematic searches. Then, we carried out a meta-analysis of the six cohort studies reporting quantitative data for masked hypertension prognosis. There is still no clear consensus definition of masked hypertension and the reproducibility of the phenomenon is unknown. Nevertheless, the prevalence of masked hypertension seems to lie between 8 and 20%, and can be up to 50% in treated hypertensive patients. Subjects with masked hypertension have a higher risk of cardiovascular accidents [hazard ratios: 1.92 (1.51-2.44)] than normotensive subjects. This is due to a possible failure to recognize and appropriately manage this particular form of hypertension, the frequent association with other risk factors and coexisting target organ damage. The remaining unresolved questions are as follows: is masked hypertension a clinical entity that requires identification and characterization or a statistical phenomenon linked to the variability of blood pressure measurements?; because screening of the entire population is not feasible, how to identify individuals with masked hypertension?; and, in the absence of randomized trial, how to treat masked hypertension?

  18. What Is Being Masked in Object Substitution Masking?

    Science.gov (United States)

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  19. 全麻机械通气SLIPA喉罩漏气相关因素分析%Factors associated with gas leakage in use of streamlined liner of the pharynx airway with la-ryngeal mask airway under general anesthesia

    Institute of Scientific and Technical Information of China (English)

    张庆兵; 韩苗华; 周懿; 封丽丽; 刘佳; 刘毅

    2014-01-01

    Objective:To verify the factors associated with gas leakage in applying of streamlined liner of the pharyngeal airway ( SLIPA) with classic la-ryngeal mask airway (LMA) to mechanically ventilated patients in general anesthesia.Methods:260 patients undergone minor surgery with general anes-thesia were included and recorded regarding the gender, ages, body mass index, Mallampati classification, neck circumference, thyromental distance (TMD),mandibular length,width of mouth opening and status of teeth before anesthesia.Selection of the LMA size was complied to the width of thyroid cartilage of patients,and determination of LMA leakage was based on the operator′s experience and tidal volume monitoring.χ2 test was used to analyze the difference concerning the parameters described previously between the leakage group and the non-leakage group.Results:SLIPA LMAs were successfully applied in 254 patients,whereas LMA leakage was found in 17 cases.Higher incidence of the gas leakage was seen patients with shorter TMD (35% vs. 5%) and without teeth (29% vs.3% )when the two groups were compared (P<0.05).Conclusion:SLIPA LMA can be safely used in mechanically ventilated patients under general anesthesia,yet higher incidences of gas leakage may be involved in those with short TMD or without teeth.%目的:筛选全麻机械通气使用SLIPA喉罩时发生漏气的相关因素。方法:选取短小全麻手术260例,记录患者性别、年龄、体质量指数、Mallampati分级、颈围、甲颏距、下颌骨水平长度、张口度以及牙齿情况。根据甲状软骨宽度选取合适型号的喉罩。操作者根据临床经验和潮气量监测判断喉罩是否漏气。采用卡方检验比较喉罩漏气和未漏气两组患者间各项指标的差异。结果:260例患者成功置入SLIPA喉罩,其中17例出现喉罩漏气。与喉罩未漏气患者相比,喉罩漏气患者短颏甲距(35%vs.5%)和无牙(29%vs.3

  20. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  1. Masked Repetition Priming Using Magnetoencephalography

    Science.gov (United States)

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  2. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...... Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (P...

  3. Biological Activity of Masked Endotoxin

    Science.gov (United States)

    Schwarz, Harald; Gornicec, Jan; Neuper, Theresa; Parigiani, Maria Alejandra; Wallner, Michael; Duschl, Albert; Horejs-Hoeck, Jutta

    2017-01-01

    Low endotoxin recovery (LER) is a recently discovered phenomenon describing the inability of limulus amebocyte lysate (LAL)-based assays to detect lipopolysaccharide (LPS) because of a “masking effect” caused by chelators or detergents commonly used in buffer formulations for medical products and recombinant proteins. This study investigates the masking capacities of different buffer formulations and whether masked endotoxin is biologically active. We show that both naturally occurring endotoxin as well as control standard endotoxin can be affected by LER. Furthermore, whereas masked endotoxin cannot be detected in Factor C based assays, it is still detectable in a cell-based TLR4-NF-κB-luciferase reporter gene assay. Moreover, in primary human monocytes, masked LPS induces the expression of pro-inflammatory cytokines and surface activation markers even at very low concentrations. We therefore conclude that masked LPS is a potent trigger of immune responses, which emphasizes the potential danger of masked LPS, as it may pose a health threat in pharmaceutical products or compromise experimental results. PMID:28317862

  4. Hg-Mask Coronagraph

    Science.gov (United States)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  5. Mechanical alignment of substrates to a mask

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Honan, Michael; Amato, Luigi G.; Grant, Christopher Neil; Strassner, James D.

    2016-11-08

    A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

  6. Vibrotactile masking through the body.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-09-01

    Touches on one hand or forearm can affect tactile sensitivity at contralateral locations on the opposite side of the body. These interactions suggest an intimate connection between the two sides of the body. Here, we explore the effect of masking not across the body but through the body by measuring the effect of a masking stimulus on the back on the tactile sensitivity of the corresponding point on the front. Tactile sensitivity was measured on each side of the stomach, while vibrotactile masking stimulation was applied to one side of the front and to points on the back including the point directly behind the test point on the front. Results were compared to sensitivity, while vibrotactile stimulation was applied to a control site on the shoulder. A reduction in sensitivity of about .8 dB was found that required the masking stimulus to be within about 2 cm of the corresponding point on the back.

  7. An instructional video enhanced bag-mask ventilation quality during simulated newborn resuscitation.

    Science.gov (United States)

    Deindl, Philipp; Schwindt, Jens; Berger, Angelika; Schmölzer, Georg M

    2015-01-01

    Approximately 20% of newborns infants need respiratory support at birth. This study evaluated whether video-based education could improve quality of positive pressure ventilation (PPV) performed by inexperienced staff during neonatal resuscitation. Fourth-year medical students were randomly paired and instructed to give PPV to a modified manikin as single-person resuscitators and as two-person-paired resuscitators using either an air cushion rim mask or a round mask before and after watching a self-instructional video. Airway pressure, gas flow, tidal volume and mask leak were recorded. PPV performance quality was analysed using video recording. Mask leak was lower during one-person ventilation when using the air cushion rim mask (56 ± 16%) compared to the round mask (71 ± 19%). Round mask leak during one-person ventilation was significantly lower when using the two point top hold in contrast to the 'o.k.' rim hold (before training: 63 ± 22% vs. 72 ± 18%, after training: 57 ± 17% vs. 77 ± 12%). Watching a self-instructional video improved performance quality scores of both correct head positioning, and the quality of airway manoeuvres compared to baseline, however mask leak was not significantly reduced. A self-instructional video significantly improved bag mask PPV performance in inexperienced providers but did not improve mask leak in a model of neonatal resuscitation. ©2014 Foundation Acta Paediatrica. Published by John Wiley & Sons Ltd.

  8. Mask specification guidelines in spacer patterning technology

    Science.gov (United States)

    Hashimoto, Kohji; Mukai, Hidefumi; Miyoshi, Seiro; Yamaguchi, Shinji; Mashita, Hiromitsu; Kobayashi, Yuuji; Kawano, Kenji; Hirano, Takashi

    2008-11-01

    We have studied both the mask CD specification and the mask defect specification for spacer patterning technology (SPT). SPT has the possibility of extending optical lithography to below 40nm half-pitch devices. Since SPT necessitates somewhat more complicated wafer process flow, the CD error and mask defect printability on wafers involve more process factors compared with conventional single-exposure process (SEP). This feature of SPT implies that it is very important to determine mask-related specifications for SPT in order to select high-end mask fabrication strategies; those are for mask writing tools, mask process development, materials, inspection tools, and so on. Our experimental studies reveal that both mask CD specification and mask defect specification are somehow relaxed from those in ITRS2007. This is most likely because SPT reduces mask CD error enhanced factor (MEF) and the reduction of line-width roughness (LWR).

  9. Contralateral tactile masking between forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-03-01

    Masking effects have been demonstrated in which tactile sensitivity is affected when one touch is close to another on the body surface. Such effects are likely a result of local lateral inhibitory circuits that sharpen the spatial tuning of a given tactile receptor. Mutually inhibitory pathways have also been demonstrated between cortical tactile maps of the two halves of the body. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at contralateral locations. Here, we measure the spatial tuning and effect of posture on this contralateral masking effect. Tactile sensitivity was measured on one forearm, while vibrotactile masking stimulation was applied to the opposite arm. Results were compared to sensitivity while vibrotactile stimulation was applied to a control site on the right shoulder. Sensitivity on the forearm was reduced by over 3 dB when the arms were touching and by 0.52 dB when they were held parallel. The masking effect depended on the position of the masking stimulus. Its effectiveness fell off by 1 STD when the stimulus was 29 % of arm length from the corresponding contralateral point. This long-range inhibitory effect in the tactile system suggests a surprisingly intimate relationship between the two sides of the body.

  10. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  11. Production mask composition checking flow

    Science.gov (United States)

    Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Wang, Alice; Lin, Roger; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2016-05-01

    The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations including writing, etching, metrology, etc. There still exist many potential errors that could occur when the frame, main circuit and dummies all together form a whole reticle. The MDCC flow combines the design rule check (DRC) and MRC concepts to adapt to the complex patterns in today's wafer production technologies. Although photomask data has unique characteristics, the MRC tool in Calibre® MDP can easily achieve mask composition by using the Extended MEBES job deck (EJB) format. In EJB format, we can customize the combination of any input layers in an IC design layout format, such as OASIS. Calibre MDP provides section-based processing for many standard verification rule format (SVRF) commands that support DRC-like checks on mask data. Integrating DRC-like checking with EJB for layer composition, we actually perform reticle-level DRC, which is the essence of MDCC. The flow also provides an early review environment before the photomask pattern files are available. Furthermore, to incorporate the MDCC in our production flow, runtime is one of the most important indexes we consider. When the MDCC is included in the tape-out flow, the runtime impact is very limited. Calibre, with its multi-threaded processes and good scalability, is the key to achieving acceptable runtime. In this paper, we present real case runtime data for 28nm and 14nm technology nodes, and prove the practicability of placing MDCC into mass production.

  12. Masked Hypertension in Diabetes Mellitus

    Science.gov (United States)

    Franklin, Stanley S.; Thijs, Lutgarde; Li, Yan; Hansen, Tine W.; Boggia, José; Liu, Yanping; Asayama, Kei; Björklund-Bodegård, Kristina; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Kuznetsova, Tatiana; Stolarz-Skrzypek, Katarzyna; Tikhonoff, Valérie; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Sandoya, Edgardo; Kawecka-Jaszcz, Kalina; Filipovský, Jan; Imai, Yutaka; Wang, Jiguang; Ibsen, Hans; O’Brien, Eoin; Staessen, Jan A.

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (Phypertensives tended to be higher than in normotensives (hazard rate [HR], 1.96; 95% confidence interval [CI], 0.97–3.97; P=0.059), similar to untreated stage 1 hypertensives (HR, 1.07; CI, 0.58–1.98; P=0.82), but less than stage 2 hypertensives (HR, 0.53; CI, 0.29–0.99; P=0.048). In contrast, cardiovascular risk was not significantly different in antihypertensive-treated diabetic-masked hypertensives, as compared with the normotensive comparator group (HR, 1.13; CI, 0.54–2.35; P=0.75), stage 1 hypertensives (HR, 0.91; CI, 0.49–1.69; P=0.76), and stage 2 hypertensives (HR, 0.65; CI, 0.35–1.20; P=0.17). In the untreated diabetic-masked hypertensive population, mean conventional systolic/diastolic blood pressure was 129.2±8.0/76.0±7.3 mm Hg, and mean daytime systolic/diastolic blood pressure 141.5±9.1/83.7±6.5 mm Hg. In conclusion, masked hypertension occurred in 29% of untreated diabetics, had comparable cardiovascular risk as stage 1 hypertension, and would require considerable reduction in conventional blood pressure to reach daytime ambulatory treatment goal. Importantly, many hypertensive diabetics when receiving antihypertensive therapy can present with normalized conventional and elevated ambulatory blood pressure that mimics masked hypertension. PMID:23478096

  13. Informational masking and musical training.

    Science.gov (United States)

    Oxenham, Andrew J; Fligor, Brian J; Mason, Christine R; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  14. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  15. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  16. Mask qualification strategies in a wafer fab

    Science.gov (United States)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  17. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show...

  18. Shadows alter facial expressions of Noh masks.

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety)", which highly appreciates subtle emotional expressions in the darkness.

  19. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  20. Spatial release from informational masking

    Science.gov (United States)

    Rakerd, Brad; Aaronson, Neil L.

    2001-05-01

    A new method for investigating spatial release from informational masking was developed and employed in two experiments. The new method is computer controlled and efficient. It employs the versatile coordinate response measure speech stimulus set [Bolia et al., J. Acoust. Soc. Am. 107, 1065 (2000)]. The experiments were conducted in an anechoic room, with a primary loudspeaker in front of the listener and a secondary loudspeaker at 60 deg to the right. Target messages were presented from the primary speaker only. For a standard, distractor messages, simultaneous with the target, were also presented from the primary speaker only. Spatial release was measured by presenting the distractors from both primary and secondary speakers with a temporal offset. Experiment 1 fixed the offset (secondary leading, +4 ms) and varied the number of distractors (1 to 3) and the target-to-distractor ratio (-12 to +4 dB). Masking release, sometimes as large as 10 dB, was found for all combinations of these variables. Experiment 2 varied the offset over a wide range of values. Substantial release from masking was found for both positive and negative offsets, but only in the range in which speech echoes are suppressed (<50 ms). [Work supported by NIDCD grant DC 00181.

  1. Cosmic Ballet or Devil's Mask?

    Science.gov (United States)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  2. High performance mask fabrication process for the next-generation mask production

    Science.gov (United States)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2014-07-01

    ArF immersion lithography combined with double patterning has been used for fabricating below half pitch 40nm devices. However, when pattern size shrinks below 20nm, we must use new technology like quadruple patterning process or next generation lithography (NGL) solutions. Moreover, with change in lithography tool, next generation mask production will be needed. According to ITRS 2013, fabrication of finer patterns less than 15nm will be required on mask plate in NGL mask production 5 years later [1]. In order to fabricate finer patterns on mask, higher resolution EB mask writer and high performance fabrication process will be required. In a previous study, we investigated a potential of mask fabrication process for finer patterning and achieved 17nm dense line pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer and chemically amplified resist [2][3]. After a further investigation, we constructed higher performance mask process by using new EB mask writer EBM9000. EBM9000 is the equipment supporting hp16nm generation's photomask production and has high accuracy and high throughput. As a result, we achieved 15.5nm pattern on mask with high productivity. Moreover, from evaluation of isolated pattern, we proved that current mask process has the capability for sub-10nm pattern. These results show that the performance of current mask fabrication process have the potential to fabricate the next-generation mask.

  3. Mask data volume: explosion or damp squib?

    Science.gov (United States)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell

    2005-11-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  4. Compact excimer laser light source for optical (mask) inspection systems

    Science.gov (United States)

    Pflanz, Tobias; Huber, Heinz

    2001-04-01

    The discharge pumped excimer laser is a gas laser providing ultra violet radiation with well defined spectral, temporal and spatial properties. The fast development of excimer lasers in recent years has succeeded in designing very compact, turn-key systems delivering up to 10 W of radiation at 248 nm (5 W at 193 nm and 1 W at 157 nm) with repetition rates up to 1000 Hz. Experimental data on important beam properties of excimer lasers in the field of mask inspection are being presented and discussed. Relevant parameters are spectral bandwidth, energetic pulse-to-pulse stability, pulse duration, beam pointing stability, beam direction stability, beam dimension, beam profile and coherence. We will compare the excimer laser with lamp sources and continuous wave lasers in the framework of these parameters. The discussion will show future opportunities of compact excimer lasers in optical inspection as well as in mask writing systems, improving resolution and throughput.

  5. Helical apodizers for tunable hyper Gaussian masks

    Science.gov (United States)

    Ojeda-Castañeda, J.; Ledesma, Sergio; Gómez-Sarabia, Cristina M.

    2013-09-01

    We discuss an optical method for controlling the half-width of Gaussian like transmittance windows, by using a pair of absorption masks that have both radial and helical amplitude variations. For describing the radial part of the proposed masks, we employ amplitude transmittance profiles of the form T(ρ) = exp(- ρ s ). For s = 2, one has an amplitude transmittance that is proportional to a Gaussian function. A sub Gaussian mask is defined by a value of s 2, one has super Gaussian masks. Our discussion considers that any of these radially varying masks has also helical modulations. We show that by using a suitable pair of this type of masks, one can control the halfwidth of Gaussian like windows.

  6. Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

    Energy Technology Data Exchange (ETDEWEB)

    Wagner, E. [3D-OXIDES, 70 rue Gustave Eiffel, Saint Genis Pouilly 01630 (France); Sandu, C.S., E-mail: cosmin.sandu@3d-oxides.com [3D-OXIDES, 70 rue Gustave Eiffel, Saint Genis Pouilly 01630 (France); Laboratoire de Céramique, Ecole Polytechnique Fédérale de Lausanne, Station 12, CH-1015 Lausanne (Switzerland); Harada, S.; Benvenuti, G. [3D-OXIDES, 70 rue Gustave Eiffel, Saint Genis Pouilly 01630 (France); Savu, V. [Laboratoire de Microsystèmes 1, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne (Switzerland); Muralt, P. [Laboratoire de Céramique, Ecole Polytechnique Fédérale de Lausanne, Station 12, CH-1015 Lausanne (Switzerland)

    2015-07-01

    Chemical Beam Vapour Deposition is a gas phase deposition technique, operated under high vacuum conditions, in which evaporated chemical precursors are thermally decomposed on heated substrates to form a film. In the particular equipment used in this work, different chemical beams effuse from a plurality of punctual precursor sources with line of sight trajectory to the substrate. A shadow mask is used to produce 3D-structures in a single step, replicating the apertures of a stencil as deposits on the substrate. The small gap introduced between substrate and mask induces a temperature difference between both surfaces and is used to deposit selectively solely on the substrate without modifying the mask, taking advantage of the deposition rate dependency on temperature. This small gap also enables the deposition of complex patterned structures resulting from the superposition of many patterns obtained using several precursor beams from different directions through a single mask aperture. A suitable process parameter window for precursor flow and substrate temperature is evidenced to maximize resolution. - Highlights: • Micro-feature growth with stencil mask by Chemical Beam Vapour Deposition • Growth of complex structured oxide films in one step • The gap between substrate and mask avoids deposition on the stencil. • Fabrication of 3D structures by superposing deposits from several beams • The versatile setup combines few chemical beams, variable geometry and stencil mask patterns.

  7. Computational defect review for actinic mask inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram

    2013-04-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The limitation of 1.35 NA posed by water-based lithography has led to the application of various resolution enhancement techniques (RET), for example, use of strong phase-shifting masks, aggressive OPC and sub-resolution assist features, customized illuminators, etc. The adoption of these RET techniques combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for a mask inspection engineer. Inspecting masks under their actinic-aerial image conditions would detect defects that are more likely to print under those exposure conditions. However, this also makes reviewing such defects in their low-contrast aerial images very challenging. On the other hand, inspecting masks under higher resolution inspection optics would allow for better viewing of defects post-inspection. However, such inspections generally would also detect many more defects, including printable and nuisance, thereby making it difficult to judge which are of real concern for printability on wafer. Often, an inspection engineer may choose to use Aerial and/or high resolution inspection modes depending on where in the process flow the mask is and the specific device-layer characteristics of the mask. Hence, a comprehensive approach is needed in handling defects both post-aerial and post-high resolution inspections. This analysis system is designed for the Applied Materials Aera™ mask inspection platform, all data reported was collected using the Aera.

  8. X-ray lithography masking

    Science.gov (United States)

    Smith, Henry I. (Inventor); Lim, Michael (Inventor); Carter, James (Inventor); Schattenburg, Mark (Inventor)

    1998-01-01

    X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

  9. Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

    Science.gov (United States)

    Liebmann, Lars W.; Graur, Ioana C.; Leipold, William C.; Oberschmidt, James M.; O'Grady, David S.; Regaill, Denis

    1999-07-01

    While the benefits of alternating phase shifted masks in improving lithographic process windows at increased resolution are well known throughout the lithography community, broad implementation of this potentially powerful technique has been slow due to the inherent complexity of the layout design and mask manufacturing process. This paper will review a project undertaken at IBM's Semiconductor Research and Development Center and Mask Manufacturing and Development facility to understand the technical and logistical issues associated with the application of alternating phase shifted mask technology to the gate level of a full microprocessor chip. The work presented here depicts an important milestone toward integration of alternating phase shifted masks into the manufacturing process by demonstrating an automated design solution and yielding a functional alternating phase shifted mask. The design conversion of the microprocessor gate level to a conjugate twin shifter alternating phase shift layout was accomplished with IBM's internal design system that automatically scaled the design, added required phase regions, and resolved phase conflicts. The subsequent fabrication of a nearly defect free phase shifted mask, as verified by SEM based die to die inspection, highlights the maturity of the alternating phase shifted mask manufacturing process in IBM's internal mask facility. Well defined and recognized challenges in mask inspection and repair remain and the layout of alternating phase shifted masks present a design and data preparation overhead, but the data presented here demonstrate the feasibility of designing and building manufacturing quality alternating phase shifted masks for the gate level of a microprocessor.

  10. Model-based mask verification on critical 45nm logic masks

    Science.gov (United States)

    Sundermann, F.; Foussadier, F.; Takigawa, T.; Wiley, J.; Vacca, A.; Depre, L.; Chen, G.; Bai, S.; Wang, J.-S.; Howell, R.; Arnoux, V.; Hayano, K.; Narukawa, S.; Kawashima, S.; Mohri, H.; Hayashi, N.; Miyashita, H.; Trouiller, Y.; Robert, F.; Vautrin, F.; Kerrien, G.; Planchot, J.; Martinelli, C.; Di-Maria, J. L.; Farys, V.; Vandewalle, B.; Perraud, L.; Le Denmat, J. C.; Villaret, A.; Gardin, C.; Yesilada, E.; Saied, M.

    2008-05-01

    In the continuous battle to improve critical dimension (CD) uniformity, especially for 45-nanometer (nm) logic advanced products, one important recent advance is the ability to accurately predict the mask CD uniformity contribution to the overall global wafer CD error budget. In most wafer process simulation models, mask error contribution is embedded in the optical and/or resist models. We have separated the mask effects, however, by creating a short-range mask process model (MPM) for each unique mask process and a long-range CD uniformity mask bias map (MBM) for each individual mask. By establishing a mask bias map, we are able to incorporate the mask CD uniformity signature into our modelling simulations and measure the effects on global wafer CD uniformity and hotspots. We also have examined several ways of proving the efficiency of this approach, including the analysis of OPC hot spot signatures with and without the mask bias map (see Figure 1) and by comparing the precision of the model contour prediction to wafer SEM images. In this paper we will show the different steps of mask bias map generation and use for advanced 45nm logic node layers, along with the current results of this new dynamic application to improve hot spot verification through Brion Technologies' model-based mask verification loop.

  11. Shadows Alter Facial Expressions of Noh Masks

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  12. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  13. Masking the Feeling of Being Stupid.

    Science.gov (United States)

    Smith, Sally L.

    1988-01-01

    Teaching experience at The Lab School of Washington has shown that learning-disabled children and adults cope with their lack of self-esteem and feelings of stupidity by developing masks to hide their hurt. These include masks of super-competence, helplessness, invisibility, clowning, injustice collecting, indifference, boredom, outrageousness,…

  14. Masked hypertension, a review of the literature.

    NARCIS (Netherlands)

    Verberk, W.J.; Thien, Th.; Leeuw, P.W. de

    2007-01-01

    Masked hypertension (blood pressure that is normal in the physicians' office but elevated elsewhere) is a common phenomenon as prevalence among studies varies from 8 to 45% and is seen at all ages. large discrepancies, however, exist between studies that have dealt with masked hypertension. It is of

  15. Computing Challenges in Coded Mask Imaging

    Science.gov (United States)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  16. A facial mask comprising Dead Sea mud.

    Science.gov (United States)

    Abu-Jdayil, Basim; Mohameed, Hazim A

    2006-01-01

    Many investigators have proved that Dead Sea salt and mud are useful in treating skin disorders and skin diseases. Therefore, the black mud has been extensively used as a base for the preparation of soaps, creams, and unguents for skin care. This study concerns a facial mask made mainly of Dead Sea mud. The effects of temperature and shearing conditions on the rheological behavior of the facial mask were investigated. The mud facial mask exhibited a shear thinning behavior with a yield stress. It was found that the apparent viscosity of the mask has a strong dependence on the shear rate as well as on the temperature. The facial mask exhibited a maximum yield stress and very shear thinning behavior at 40 degrees C, which is attributed to the gelatinization of the polysaccharide used to stabilize the mud particles. On the other hand, the mud mask exhibited a time-independent behavior at low temperatures and shear rates and changed to a thixotropic behavior upon increasing both the temperature and the shear rate. The shear thinning and thixotropic behaviors have a significant importance in the ability of the facial mask to spread on the skin: the Dead Sea mud mask can break down for easy spreading, and the applied film can gain viscosity instantaneously to resist running. Moreover, particle sedimentation, which in this case would negatively affect consumer acceptance of the product, occurs slowly due to high viscosity at rest conditions.

  17. [Use of respiratory masks in healthcare workers].

    Science.gov (United States)

    Ciotti, C; Bouvet, E; Abiteboul, D

    2008-08-01

    Two different types of filtering respiratory masks are available in healthcare settings. The first ones are used to protect patients from droplets coming from the mouth of healthcare workers (HCW) and the second ones are protective masks. For the moment, we lack information regarding application of Ministry of Health recommendations and on adherence of HCW to mask use. Geres, the HCW exposure risk study group, and the INRS, are now conducting a survey in several hospitals in France to evaluate the use of respiratory masks in healthcare settings. Two phases are planned. Phase I is a self survey using a questionnaire for occupational doctors and hygienists and phase II includes three steps on HCW behavior: evaluation of knowledge and practice concerning respiratory masks, evaluation of respiratory mask use, evaluation of wear and fit test in a context of airborne isolation with a FFP1 and FFP2 respiratory mask. Phase I is finished and phase II is beginning. The first phase I data show that the Ministry's recommendations are observed: respiratory masks are available, written recommendations are present; information and training are organized for healthcare workers. Phase II results are not available yet.

  18. EUV mask pilot line at Intel Corporation

    Science.gov (United States)

    Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

    2004-12-01

    The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

  19. Extinction controlled adaptive phase-mask coronagraph

    CERN Document Server

    Bourget, P; Mawet, D; Haguenauer, P

    2012-01-01

    Context. Phase-mask coronagraphy is advantageous in terms of inner working angle and discovery space. It is however still plagued by drawbacks such as sensitivity to tip-tilt errors and chromatism. A nulling stellar coronagraph based on the adaptive phase-mask concept using polarization interferometry is presented in this paper. Aims. Our concept aims at dynamically and achromatically optimizing the nulling efficiency of the coronagraph, making it more immune to fast low-order aberrations (tip-tilt errors, focus, ...). Methods. We performed numerical simulations to demonstrate the value of the proposed method. The active control system will correct for the detrimental effects of image instabilities on the destructive interference. The mask adaptability both in size, phase and amplitude also compensates for manufacturing errors of the mask itself, and potentially for chromatic effects. Liquid-crystal properties are used to provide variable transmission of an annulus around the phase mask, but also to achieve t...

  20. Mask tuning for process window improvement

    Science.gov (United States)

    Buttgereit, Ute; Birkner, Robert; Graitzer, Erez; Cohen, Avi; Triulzi, Benedetta; Romeo, Carmelo

    2011-03-01

    For the next years optical lithography stays at 193nm with a numerical aperture of 1.35. Mask design becomes more complex, mask and lithography specifications tighten. The k1 factor comes close to 0.25 which leads to a tremendously increased Mask Error Enhancement Factor (MEEF). This means that CD errors on mask are getting highly amplified on wafer. Process control becomes more important than ever. Accurate process control is a key factor to success to maintain a high yield in chip production. One key parameter to ensure a high and reliable functionality for any integrated circuit is the critical dimension uniformity (CDU). There are different contributors which impact the intra-field CD performance at wafer such as mask CD uniformity, scanner fingerprint, resist process etc. In the present work we focus on improvement of mask CD signature which is one of the main contributors to intra-field CD uniformity. The mask CD uniformity has been measured by WLCD32 which measures the CD based on proven aerial image technology. Based on this CD input the CD uniformity was corrected by CDC200TM and afterwards verified by WLCD32 measurement. The CDC200TM tool utilizes an ultrafast femto-second laser to write intra-volume shading elements (Shade-In ElementsTM) inside the bulk material of the mask. By adjusting the density of the shading elements, the light transmission through the mask is locally changed in a manner that improves wafer CDU when the corrected mask is printed. Additionally, the impact of the improved CD uniformity on the lithography process window was investigated. Goal of the work is to establish a process flow for mask CD uniformity improvement based on mask CD metrology by WLCD32 and mask CD uniformity control by CDC200TM and to verify its impact on the lithography process window. The proposed process flow will be validated by wafer prints. It was shown that the WLCD32 has an excellent correlation to wafer data and an outstanding CD repeatability. It provides

  1. Masking property of quantum random cipher with phase mask encryption

    Science.gov (United States)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  2. Space and time in masking and crowding.

    Science.gov (United States)

    Lev, Maria; Polat, Uri

    2015-01-01

    Masking and crowding are major phenomena associated with contextual modulations, but the relationship between them remains unclear. We have recently shown that crowding is apparent in the fovea when the time available for processing is limited, pointing to the strong relationship between crowding in the spatial and temporal domains. Models of crowding emphasize the size (acuity) of the target and the spacing between the target and flankers as the main determinants that predict crowding. Our model, which is based on lateral interactions, posits that masking and crowding are related in the spatial and temporal domains at the fovea and periphery and that both can be explained by the increasing size of the human perceptive field (PF) with increasing eccentricity. We explored the relations between masking and crowding using letter identification and contrast detection by correlating the crowding effect with the estimated size of the PF and with masking under different spatiotemporal conditions. We found that there is a large variability in PF size and crowding effects across observers. Nevertheless, masking and crowding were both correlated with the estimated size of the PF in the fovea and periphery under a specific range of spatiotemporal parameters. Our results suggest that under certain conditions, crowding and masking share common neural mechanisms that underlie the spatiotemporal properties of these phenomena in both the fovea and periphery. These results could explain the transfer of training gains from spatiotemporal Gabor masking to letter acuity, reading, and reduced crowding.

  3. Intact crowding and temporal masking in dyslexia.

    Science.gov (United States)

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia.

  4. Pupil Masks for Spectrophotometry of Transiting Exoplanets

    Science.gov (United States)

    Itoh, Satoshi; Matsuo, Taro; Goda, Shohei; Shibai, Hiroshi; Sumi, Takahiro

    2017-09-01

    Spectrophotometric stability, which is crucial in the spectral characterization of transiting exoplanets, is affected by photometric variations arising from field-stop loss in space telescopes with pointing jitter or primary mirror deformation. This paper focuses on a new method for removing slit-loss or field-stop-loss photometric variation through the use of a pupil mask. Two types of pupil function are introduced: the first uses conventional (e.g., Gaussian or hyper-Gaussian) apodizing patterns; whereas the second, which we call a block-shaped mask, employs a new type of pupil mask designed for high photometric stability. A methodology for the optimization of a pupil mask for transit observations is also developed. The block-shaped mask can achieve a photometric stability of 10-5 for a nearly arbitrary field-stop radius when the pointing jitter is smaller than approximately 0.7λ /D and a photometric stability of 10-6 at a pointing jitter smaller than approximately 0.5λ /D. The impact of optical aberrations and mask imperfections upon mask performance is also discussed.

  5. Mask industry assessment trend analysis: 2012

    Science.gov (United States)

    Chan, Y. David

    2012-02-01

    Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply among the top critical issues for lithography. A survey was designed by SEMATECH with input from semiconductor company mask technologists and merchant mask suppliers to objectively assess the overall conditions of the mask industry. With the continued support of the industry, this year's assessment was the tenth in the current series of annual reports. This year's survey is basically the same as the 2005 through 2011 surveys. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that ultimately produce a detailed profile of both the business and technical status of the critical mask industry. We received data from 11 companies this year, which was a record high since the beginning of the series. The responding companies represented more than 96% of the volume shipped and about 90% of the 2011 revenue for the photomask industry. These survey reports are often used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. They will continue to serve as a valuable reference to identify strengths and opportunities. Results can also be used to guide future investments in critical path issues.

  6. Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair

    NARCIS (Netherlands)

    Gonzalez, Carlos M.; Timilsina, Rajendra; Li, Guoliang; Duscher, Gerd; Rack, Philip D.; Slingenbergh, Winand; van Dorp, Willem F.; De Hosson, Jeff T. M.; Klein, Kate L.; Wu, Huimeng M.; Stern, Lewis A.

    2014-01-01

    The gas field ion microscope was used to investigate helium and neon ion beam induced etching of nickel as a candidate technique for extreme ultraviolet (EUV) lithography mask editing. No discernable nickel etching was observed for room temperature helium exposures at 16 and 30 keV in the dose range

  7. Neopuff T-piece mask resuscitator: is mask leak related to watching the pressure dial?

    Science.gov (United States)

    Tracy, Mark B; Klimek, J; Shingde, V; Hinder, M; Maheshwari, R; Tracy, S K

    2010-09-01

    The aim of the study is to compare mask leak and delivered ventilation during Neopuff (NP) mask ventilation in two modes: (i) with NP pressure dial hidden and resuscitator watching chest wall (CW) rise with, (ii) CW movement hidden and resuscitator watching NP pressure dial. Thirty-six participants gave mask ventilation to a modified manikin designed to measure mask leak and delivered ventilation for two minutes in each mode randomly assigned. Paired t-tests were used to analyse differences in mean values. Linear regression was used to determine the association of mask leak with delivered ventilation. Of 7277 inflations analysed, 3621 were observing chest wall mode (CWM) and 3656 observing NP mode (NPM). Mask leak was similar between the groups; 31.6% for CWM and 31.5% (p = 0.56) for NPM. There were no significant differences in airways pressures and expired tidal volumes (TVe) between modes. Mask leak was strongly associated with TVe (R = -0.86 p mask leak is not greater when resuscitators watch the NP pressure dial. Mask leak is related to TVe. Mask ventilation training with manikins should include tidal volume measurements. © 2010 The Author(s)/Journal Compilation © 2010 Foundation Acta Paediatrica.

  8. Printed shadow masks for organic transistors

    Science.gov (United States)

    Noguchi, Yoshiaki; Sekitani, Tsuyoshi; Someya, Takao

    2007-09-01

    We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet. After the deposition of the pentacene layer, the shadow mask is peeled off from the base film without any mechanical damages to the lower structures. The mobility in the saturation regime is 0.4cm2/Vs and the on-off ratio exceeds 105.

  9. Tom Pickering as a clinical scientist: masked hypertension.

    Science.gov (United States)

    Eguchi, Kazuo

    2010-04-01

    Masked hypertension has been 'unmasked' by the use of the out-of-office measurement of blood pressure, as home BP monitoring or ambulatory blood pressure monitoring has become available. The term masked hypertension could be used more widely than the original version of masked hypertension; morning hypertension, stress-induced hypertension, and nocturnal hypertension are all classified as subtypes of masked hypertension. Masked hypertension can also be seen in patients with diabetes, that could change clinical practice in diabetes. Masked hypertension is associated with cardiovascular events, but most of the outcome studies are on antihypertensive medications. Therefore, masked hypertension includes insufficient treatment of hypertension. In Dr Pickering's latest review of masked hypertension, prehypertension or high normal blood pressure was stressed as an associating factor with masked hypertension. The biggest theme in the field of hypertension is how we can detect masked hypertension. I present two interesting cases of possible masked hypertension in this commentary.

  10. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  11. Polishing Your Transparencies: Mounting, Masking, Overlays.

    Science.gov (United States)

    Jobe, Holly; Cannon, Glenn

    This brief guide discusses the mounting of overhead transparencies on frames, the types of mounts, the proper masking for presentation, and the use of overlays. Numerous line drawings provide the reader with a helpful visual reference. (RAO)

  12. Masking of aluminum surface against anodizing

    Science.gov (United States)

    Crawford, G. B.; Thompson, R. E.

    1969-01-01

    Masking material and a thickening agent preserve limited unanodized areas when aluminum surfaces are anodized with chromic acid. For protection of large areas it combines well with a certain self-adhesive plastic tape.

  13. Role of mask in asian shamanism

    OpenAIRE

    POVALYASHKO GALINA; ABAYEVA SABINA

    2015-01-01

    In the article there is considered a phenomena of shamanism as a cultural universal. Analysis object is a clay mask of National Museum of the Republic of Kazakhstan. It was found in Keder settlement (Kuiryktobe), located in Otrar Oasis at one of the most busy part of the Silk Road. The mask as shamanistic ritual attribute is considered as an obligatory condition for meditative function of shaman.

  14. No masking between test and mask components in perceptually different depth planes.

    Science.gov (United States)

    Hibbeler, Patrick J; Olzak, Lynn A

    2011-01-01

    2-D cues to perceived depth organization have been used to segregate test and mask stimulus components in a discrimination task. Observers made either spatial-frequency or orientation judgments on a rectangular test component by itself or in the presence of constant rectangular masks. There were two basic masking conditions: same-plane or different-plane. In the same-plane conditions, the test components and masks are perceived as existing in the same depth plane. In the different-plane conditions, the test and mask components are perceived to exist in different depth planes. The perception of different depth planes was achieved by using perceived occlusion, which could place either component closer or further from the observer. The results suggest that when test and mask components are separated into different depth planes they no longer influence one another. This effect could be observed in either depth organization, test components in front of the masks or mask components in front of the test. These results indicate that the figure-ground organization of components is not important. Only the designation as existing in the same or different depth planes affects whether or not a mask is effective.

  15. Masked Uncontrolled Hypertension in CKD.

    Science.gov (United States)

    Agarwal, Rajiv; Pappas, Maria K; Sinha, Arjun D

    2016-03-01

    Masked uncontrolled hypertension (MUCH) is diagnosed in patients treated for hypertension who are normotensive in the clinic but hypertensive outside. In this study of 333 veterans with CKD, we prospectively evaluated the prevalence of MUCH as determined by ambulatory BP monitoring using three definitions of hypertension (daytime hypertension ≥135/85 mmHg; either nighttime hypertension ≥120/70 mmHg or daytime hypertension; and 24-hour hypertension ≥130/80 mmHg) or by home BP monitoring (hypertension ≥135/85 mmHg). The prevalence of MUCH was 26.7% by daytime ambulatory BP, 32.8% by 24-hour ambulatory BP, 56.1% by daytime or night-time ambulatory BP, and 50.8% by home BP. To assess the reproducibility of the diagnosis, we repeated these measurements after 4 weeks. Agreement in MUCH diagnosis by ambulatory BP was 75-78% (κ coefficient for agreement, 0.44-0.51), depending on the definition used. In contrast, home BP showed an agreement of only 63% and a κ coefficient of 0.25. Prevalence of MUCH increased with increasing clinic systolic BP: 2% in the 90-110 mmHg group, 17% in the 110-119 mmHg group, 34% in the 120-129 mmHg group, and 66% in the 130-139 mmHg group. Clinic BP was a good determinant of MUCH (receiver operating characteristic area under the curve 0.82; 95% confidence interval 0.76-0.87). In diagnosing MUCH, home BP was not different from clinic BP. In conclusion, among people with CKD, MUCH is common and reproducible, and should be suspected when clinic BP is in the prehypertensive range. Confirmation of MUCH diagnosis should rely on ambulatory BP monitoring.

  16. Phase mask coronagraphy at JPL and Palomar

    Directory of Open Access Journals (Sweden)

    Serabyn E.

    2011-07-01

    Full Text Available For the imaging of faint companions, phase mask coronagraphy has the dual advantages of a small inner working angle and high throughput. This paper summarizes our recent work in developing phase masks and in demonstrating their capabilities at JPL. Four-quadrant phase masks have been manufactured at JPL by means of both evaporation and etching, and we have been developing liquid crystal vortex phase masks in partnership with a commercial vendor. Both types of mask have been used with our extreme adaptive optics well-corrected subaperture at Palomar to detect known brown dwarf companions as close as ~ 2.5 λ/D to stars. Moreover, our recent vortex masks perform very well in laboratory tests, with a demonstrated infrared contrast of about 10−6 at 3 λ/D, and contrasts of a few 10−7 with an initial optical wavelength device. The demonstrated performance already meets the needs of ground-based extreme adaptive optics coronagraphy, and further planned improvements are aimed at reaching the 10−10 contrast needed for terrestrial exoplanet detection with a space-based coronagraph.

  17. Claude Levi-Strauss: Mask and Myth

    Directory of Open Access Journals (Sweden)

    Senka Kovač

    2016-02-01

    Full Text Available This paper discuss a relationship between mask and myth and how the appropriate analysis by Claude Levi-Strauss may make clearer a complex field of masks in the part of North America. Claude Levi-Strauss stressed the multi- layered character of myth structure. Similar multi-layered character can be seen at the level of expression, content and meaning of Salish, Kwakiutl and other unique masks of this part of North America. Claude Levi-Strauss analysed certain myths trying to explain ‘the path’ of the masks that belong to the people with similar languages, or those who lived nearby. The mythology of Tsimshian, Tlingit and Haïda people have certain common characteristics that point to the similarities with the nearby groups (Kwakiutl. Despite differences that exist at the level of meanings of the masks, there is also common ‘mythological heritage’ of the people who used to live in the Northern Pacific Coast. Claude Levi-Strauss showed that there is no final solution in the myth analysis, and that there is no possibility that the dissection of the problem will reveal some hidden unity. "As mythical though does not want to start clearly somewhere and come somewhere, it never goes through its whole trajectory: there is always something waiting to be fullfield. The same way as rituals, myths are infinite." It seems that Levi-Strauss explanation of the Path of masks goes in that direction.

  18. VSP wave separation by adaptive masking filters

    Science.gov (United States)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  19. Uncertainty and confusion in temporal masking

    Science.gov (United States)

    Formby, C.; Zhang, T.

    2001-05-01

    In a landmark study, Wright et al. [Nature 387, 176-178 (1997)] reported an apparent backward-masking deficit in language-impaired children. Subsequently, these controversial results have been influential in guiding treatments for childhood language problems. In this study we revisited Wright et al.'s temporal-masking paradigm to evaluate listener uncertainty effects. Masked detection was measured for 20-ms sinusoids (480, 1000, or 1680 Hz) presented at temporal positions before, during, or after a gated narrowband (W=600-1400 Hz) masker. Listener uncertainty was investigated by cueing various stimulus temporal properties with a 6000-Hz sinusoid presented either ipsi- or contra-lateral to the test ear or bilaterally. The primary cueing effect was measured in the backward-masking condition for a contralateral cue gated simultaneously with the on-frequency 1000-Hz signal. The resulting cued masked-detection threshold was reduced to quiet threshold. No significant cueing effects were obtained for other signal temporal positions in the masker nor for any off-frequency signal conditions. These results indicate that (1) uncertainty can be reduced or eliminated for on-frequency backward masking by cueing the signal and (2) the deficit reported by Wright et al. for language-impaired children may reflect uncertainty and confusion rather than a temporal-processing deficit per se. [Research supported by NIDCD.

  20. 改良Proseal喉罩与改良普通喉罩在无痛纤维支气管镜检查中的气道管理%Comparison of modified Proseal laryngeal mask and three-way laryngeal mask airway for painless fiberoptic bronchoscopy in airway management in effect

    Institute of Scientific and Technical Information of China (English)

    王绍林; 张进; 张鹏; 殷骏; 俞蕾; 何磊; 程庆余; 刘小彬

    2012-01-01

    Objective To compare the effects of airway management with modified Proseal laryngeal mask airway and modified laryngeal mask airway in painless fiberoptic bronchoscopy. Methods Forty patients who scheduled for painless fiheroptic bronechscopy were randomly divided into two groups (n = 20): Modified Proseal laryngeal mask airway group (group P) and modified laryngeal mask airway group (group L). After induction of general anesthesia were inserted with hands. BP, HR and SpO2 were measured respectively before anesthesia laryngeal mask airway (To), immediately after inserting laryngeal mask airway (T1 ) and 3 min (T2). The laryngeal mask airway insertion time, complications, the ventilated assessment, fiberoptic bronchoscopy assessed and airway sealing pressure were also simultaneously recorded. Results There was no significant difference in laryngeal mask airway insertion time, BP. HR and SpO2 at each point Airway sealing pressure in group P was significantly higher than that in group L (P<0. 01). The excellent rates of ventilated assessment and fiberoptic bronchoscopy scores were both 100% in group P, and were much higher than those in group L (85%, 80% respectively F<0. 01). Blood staining in group P was less than that in group L (1 vs. 7 cases, respectively P<0. 05). Conclusion The modified Proseal laryngeal mask is better than modified laryngeal mask airway at the aspects of gas-tightness, assessment of ventilation and fiberoptic bronchoscopy. but no effects on hemodynamics in two groups.Objective To compare the effects of airway management with modified Proseal laryngeal mask airway and modified laryngeal mask airway in painless fiberoptic bronchoscopy. Methods Forty patients who scheduled for painless fiheroptic bronechscopy were randomly divided into two groups (n = 20): Modified Proseal laryngeal mask airway group (group P) and modified laryngeal mask airway group (group L). After induction of general anesthesia were inserted with hands. BP, HR and SpO2 were

  1. Clean induced feature CD shift of EUV mask

    Science.gov (United States)

    Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

    2016-05-01

    EUV developed in the last decade to the most promising Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber

  2. Optical inspection of EPL stencil masks

    Science.gov (United States)

    Lee, Po-Tung; Engelstad, Roxann L.; Lovell, Edward G.; Kawata, Shintaro; Hirayanagi, Noriyuki; Sogard, Michael R.

    2003-06-01

    We are now at a major junction in lithography where non-optical lithographies, such as Electron Projection Lithography (EPL) [1], are being introduced. The mask used in EPL is a non-transparent silicon substrate with a thin silicon (~2μm) membrane with openings for electrons to pass through acting as a scatterer. This must be inspected as defects may cause printable defects. Initial mask inspection work has used SEM inspection to find these defects. However, we have historically used optical mask inspection tools, utilising wavelengths at or above what we are using for imaging, to qualify masks. This technology has been increasingly difficult to sustain as we have moved from imaging using mercury lamp based sources to pulsed excimer laser based sources that are not very suited to the inspection imaging. Indeed, review of defects found has moved from optical microscopes to SEM based tools. Inspection tools have also evolved, with the first SEM based mask inspection tools being developed to find the smallest defects, however these have the penalty of very low throughput. We will show the potential of using optical systems for the transmissive inspection of these EPL masks. The high potential of existing tools will be shown together with the need for a next generation of inspection tools. We will show that simulations indicate that an inspection source with 193nm wavelength would be required for the detection of 50nm defects on a mask used to print 70nm dense lines. It will also be shown how the position of the defect within the membrane greatly influences detection as well as the implications of moving to a thinner silicon membrane.

  3. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  4. An etching mask and a method to produce an etching mask

    DEFF Research Database (Denmark)

    2016-01-01

    The present invention relates to an etching mask comprising silicon containing block copolymers produced by self-assembly techniques onto silicon or graphene substrate. Through the use of the etching mask, nanostructures having long linear features having sub-10 nm width can be produced....

  5. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  6. 42 CFR 84.252 - Gas masks; requirements and tests.

    Science.gov (United States)

    2010-10-01

    ... penetration after six hours of testing according to paragraph (b)(3) of this section shall not exceed 1 ppm... than four hours, the period of time for testing for vinyl chloride penetration will be performed at 150... penetration after nine hours of testing shall not exceed 1 ppm vinyl chloride.)...

  7. The power of feeder-mask respirometry as a method for examining hummingbird energetics.

    Science.gov (United States)

    Welch, Kenneth C

    2011-03-01

    Many birds spend important portions of their time and energy flying. For this reason, quantification of metabolic rates during flight is of crucial importance to understanding avian energy balance. Measurement of organismal gas exchange rates using a mask enclosing the whole head or respiratory orifices has served as an important tool for studying animal energetics because it can free the rest of the body, permitting movement. Application of so-called "mask respirometry" to the study of avian forward flight energetics presents unique challenges because birds must be tethered to gas analysis equipment thus typically necessitating use of a wind tunnel. Resulting potential alterations to a study organism's behaviour, physiology, and aerodynamics have made interpretation of such studies contentious. In contrast, the study of hovering flight energetics in hummingbirds using a specialized form of mask respirometry is comparatively easy and can be done without a wind tunnel. Small size, hovering flight, and a nectarivorous diet are characteristics shared by all hummingbird species that make these birds ideally suited for this approach. Specifically, nectar feeders are modified to function as respirometry masks hummingbirds voluntarily respire into when hover-feeding. Feeder-mask based respirometry has revealed some of the highest vertebrate metabolic rates in hovering hummingbirds. In this review I discuss techniques for the successful measurement of metabolic rate using feeder-mask respirometry. I also emphasize how this technique has been used to address fundamental questions regarding avian flight energetics such as capacities for fuel use and mechanisms by which ecology, behaviour and energy balance are linked. Copyright © 2010 Elsevier Inc. All rights reserved.

  8. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  9. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  10. OPC aware mask and wafer metrology

    Science.gov (United States)

    Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik M.; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt G.; England, Jonathan G.; Howard, William B.

    2002-08-01

    Lithography at its limit of resolution is a highly non- linear pattern transfer process. Typically the shapes of printed features deviate considerably from their corresponding features in the layout. This deviation is known as Optical Proximity Effect, and its correction Optical Proximity effect Correction or OPC. Although many other so-called optical enhancement technologies are applied to cope with the issues of lithography at its limit of resolution, almost none of these can re-store the linearity of the pattern transfer. Hence fully functional OPC has become a very basic requirement for current and future lithography processes. In general, proximity effects are two-dimensional (2d) effects. Thus any measurement of proximity effects or any characterization of the effectiveness of OPC has to be two- dimensional. As OPC modifies shapes in the data for mask writing in a way to compensate for the expected proximity effects of the following processing steps, parameters describing the particular OPC-mask quality is a major concern. One-dimensional mask specifications, such as linewidth mean-to-target and uniformity, pattern placement, and maximum size of a tolerable defect, are not sufficient anymore to completely describe the functionality of a given mask for OPC. Two-dimensional mask specifications need to be evaluated. We present in this paper a basic concept for 2d metrology. Examples for 2d measurements to assess the effectiveness of OPC are given by the application of an SEM Image Analysis tool to an advanced 130nm process.

  11. Not All Masks Are Created Equal: Masking Success in Clinical Trials of Children and Adolescents.

    Science.gov (United States)

    Jones, Lauren; Black, Sarah R; Arnold, L Eugene; Fristad, Mary A

    2017-07-17

    The current study assessed the success of masking omega-3 (Ω3) and psychotherapy in clinical trials of youth with depression or bipolar spectrum disorder. Participants were youth ages 7-14 with DSM-IV-TR diagnosed depressive (n = 72) or bipolar spectrum (n = 23) disorders. Inclusion diagnoses were depressive disorder, cyclothymic disorder, or bipolar disorder not otherwise specified. Exclusion diagnoses included bipolar I or II disorder, chronic medical condition or autism. Youth participated in 2 × 2 randomized controlled trials, in which they received Ω3 or placebo (PBO) and psychoeducational psychotherapy (PEP) or active monitoring (AM). Participants and study staff (including independent interviewers) were masked to Ω3/PBO allocation. Besides the masked independent interviewers, one coprincipal investigator (Co-PI) was fully masked to both conditions and completed all consensus conference ratings postrandomization. At the endpoint assessment or last completed interview, interviewers and the masked Co-PI guessed whether each child was assigned to Ω3 or PBO and to PEP or AM. Masking failure was calculated using the degree of correct guesses above chance level using binomial tests across all participants for Ω3 versus PBO and PEP versus AM. For all guessers, Ω3 allocation was guessed correctly approximately half the time (50%-52.5%). Rates of correct guessing were higher for PEP, but only the interviewer guesses were correct significantly more often (58.5%-68.7%) than chance. Reporting of masking success should be an essential element of RCTs. Psychotherapy is generally more difficult to mask, but with attentive masking procedures reasonable masking can be achieved.

  12. High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma

    Directory of Open Access Journals (Sweden)

    Chia-Pin Yeh

    2016-08-01

    Full Text Available Reactive ion etching (RIE technology for iridium with CF4/O2/Ar gas mixtures and aluminum mask at high temperatures up to 350 °C was developed. The influence of various process parameters such as gas mixing ratio and substrate temperature on the etch rate was studied in order to find optimal process conditions. The surface of the samples after etching was found to be clean under SEM inspection. It was also shown that the etch rate of iridium could be enhanced at higher process temperature and, at the same time, very high etching selectivity between aluminum etching mask and iridium could be achieved.

  13. Communication masking in marine mammals: A review and research strategy.

    Science.gov (United States)

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals.

  14. Coherent Diffractive Imaging Using Randomly Coded Masks

    CERN Document Server

    Seaberg, Matthew H; Turner, Joshua J

    2015-01-01

    Coherent diffractive imaging (CDI) provides new opportunities for high resolution X-ray imaging with simultaneous amplitude and phase contrast. Extensions to CDI broaden the scope of the technique for use in a wide variety of experimental geometries and physical systems. Here, we experimentally demonstrate a new extension to CDI that encodes additional information through the use of a series of randomly coded masks. The information gained from the few additional diffraction measurements removes the need for typical object-domain constraints; the algorithm uses prior information about the masks instead. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments. Diffraction patterns are collected with up to 15 different masks placed between a CCD detector and a single sample. Phase retrieval is performed using a convex relaxation routine known as "PhaseCut" followed by a variation on Fienup's input-output algorit...

  15. Polymer Masks for nanostructuring of graphene

    DEFF Research Database (Denmark)

    Shvets, Violetta

    This PhD project is a part of Center for Nanostructured Graphene (CNG) activities. The aim of the project is to develop a new lithography method for creation of highly ordered nanostructures with as small as possible feature and period sizes. The method should be applicable for graphene...... polymer masks is developed. Mask fabrication is realized by microtoming of 30-60 nm thin sections from pre-aligned polymer monoliths with different morphologies. The resulting polymer masks are then transferred to both silicon and graphene substrates. Hexagonally packed hole patterns with 10 nm hole...... diameter and 20 nm periodicity are successfully transferred to both substrates. The method allowed to realize the first ever transfer of moiré patterns to silicon. Furthermore, in collaboration with CNG, device with nanostructured graphene are fabricated and electrical measurements made on these devices...

  16. Improved Mask Protected DES using RSA Algorithm

    Directory of Open Access Journals (Sweden)

    Asha Latha S.

    2016-01-01

    Full Text Available The data encryption standard is a pioneering and farsighted standard which helped to set a new paradigm for encryption standards. But now DES is considered to be insecure for some application. Asymmetric mask protected DES is an advanced encryption method for effectively protecting the advanced DES. There are still probabilities to improve its security. This paper propose a method, which introduce a RSA key generation scheme in mask protected DES instead of plain key, which result in enhancement in the security of present asymmetric mask protected DES. We further propose a Vedic mathematical method of RSA implementation which reduce the complexity of computation in RSA block thereby resulting in reduced delay (four timesthat improves the performance of overall system. The software implementation was performed using Xilinx 13.2 and Model-Sim was used for the simulation environment.

  17. Metacontrast masking is processed before grapheme-color synesthesia.

    Science.gov (United States)

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  18. Further beyond: registration and overlay control enhancements for optical masks

    Science.gov (United States)

    Gorhad, Kujan; Cohen, Avi; Avizemer, Dan; Dmitriev, Vladimir; Beyer, Dirk; Degel, Wolfgang; Kirsch, Markus

    2014-10-01

    Mask registration control is one of the key performance specifications during the mask qualification process. It is becoming an important factor for yield improvement with the continuously tightening registration specs driven by tight wafer overlay specs. Understanding the impact of miss classified masks on the final wafer yield is gaining more and more attention, especially with the appearance of Multiple Patterning Technologies, where mask to mask overlay effect on wafer is heavily influenced by mask registration. ZEISS has established a promising closed loop solution implemented in the mask house, where the PROVE® system - a highly accurate mask registration and overlay metrology measurement tool, is being used to feed the RegC® - a registration and mask to mask overlay correction tool that can also accurately predict the correction potential in advance. The well-established RegC® process typically reaches 40-70% improvement of the mask registration/overlay error standard deviation. The PROVE® - RegC® closed loop solution has several advantages over alternative registration control methods apart of the mask re-write saving. Among the advantages is the capability to correct for pellicle mounting registration effects without the need to remove the pellicle. This paper will demonstrate improved method for enhanced mask to mask overlay control based on a new scheme of data acquisition and performance validation by the PROVE®. The mask registration data as well as additional mask information will be used to feed the RegC® correction process. Significantly improved mask to mask overlay correction results will be discussed and presented in details.

  19. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  20. Advances in mask fabrication and alignment for masked ion-beam lithography

    Science.gov (United States)

    Stumbo, David P.; Damm, George A.; Engler, D. W.; Fong, F. O.; Sen, S.; Wolfe, John C.; Randall, John N.; Mauger, Phillip E.; Shimkunas, Alex R.; Loeschne, Hans

    1990-05-01

    This paper describes recent developments in three areas ofmasked ion beam lithography (MIBL). These are 1) fabrication oflarge area, low distortion, silicon stencilmasks for demagnifying ion projection lithography, 2) fabrication ofstencil masks with nanometer scale resolution for 1:1 proximity printing, and 3) development of a direct method of alignment using the ion beam induced fluorescence of Si02. These topics are discussed below. Demagnifying ion projection masks: We describe the fabrication of stencil masks in large area, low stress (10 MPa), n-type silicon membranes. The projection masks have a silicon foil area 95 mm in diameter, thicknesses between 1.5-5 and resolution of0.6um. Measured distortion (3a) in the IPL masks ranges between 0.23gm and 0.65,um, with an experimental error of 0.20 1um. Proximity printing masks: A process is described for fabricating stencil masks with 50 nm resolution in low stress, n-type silicon membranes. Membranes less than 0.5 ,ttm thick are shown to be free of the sidewall taper that limits resolution in thicker masks. These thin membranes show a slightly flared profile due to the imperfectly collimated etching ions. Alignment: A direct method of alignment is being developed which uses the ion beam induced fluorescence of Si02 marks. Fluorescence yield is characterized as a function of ion energy and resist coating thickness. The yield for Si02 is in the range between 0.1-1.0 photons/proton, while the yields for Si, Al, and photoresist are negligibly small. Thus, a simple alignment technique can be implemented where registration of a grating in the mask with a corresponding oxide pattern is detected as a fluorescence maximum. A simple model predicts that 50 nm alignment can be accomplished, following a 1 im prealignment, in 2 seconds.

  1. Adaptation to different noninvasive ventilation masks in critically ill patients

    Directory of Open Access Journals (Sweden)

    Renata Matos da Silva

    2013-06-01

    Full Text Available OBJECTIVE: To identify which noninvasive ventilation (NIV masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%. Total face masks were the most commonly used (in 74.7%, followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively. Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

  2. A new approach for defect inspection on large area masks

    Science.gov (United States)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  3. Defect printability in CPL mask technology

    Science.gov (United States)

    Kuijten, Jan-Pieter; Verhappen, Arjan; Pijnenburg, Wil; Conley, Will; Litt, Lloyd C.; Wu, Wei; Montgomery, Patrick; Roman, Bernard J.; Kasprowicz, Bryan S.; Progler, Christopher J.; Socha, Robert J.; Van Den Broeke, Douglas J.; Schaefer, Erika; Cook, Pat

    2004-05-01

    Each generation of semiconductor device technology drive new and interesting resolution enhancement technology (RET"s). The race to smaller and smaller geometry"s has forced device manufacturers to k1"s approaching 0.40. The authors have been investigating the use of Chromeless phase-shifting masks (CPL) exposed with ArF, high numerical aperture (NA), and off-axis illumination (OAI) has been shown to produce production worthy sub-100nm resist patterns with acceptable overlapped process window across feature pitch. These new reticle technologies have many issues that are similar to simple binary masks. The authors have investigated the printability of defects in CPL mask technology. Programmed defects of various sizes and types have been simulated and printed for sub 100nm imaging. High resolution scanning electron microscopy has been used to characterize these defects and develop an understanding of size and type that prints. In this paper the authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. The authors have built a number of test structures that require superior 2D control for SRAM gate structures. Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds.

  4. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  5. The fastest saccadic responses escape visual masking.

    Directory of Open Access Journals (Sweden)

    Sébastien M Crouzet

    Full Text Available Object-substitution masking (OSM occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. The reduction of target visibility occurring after OSM has been suggested to result from a specific interference with reentrant visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task, which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference under either OSM or backward masking, as they did under the low-contrast condition. This finding supports the hypothesis that masking interferes mostly with reentrant processing at later stages, while leaving early feedforward processing largely intact.

  6. The laryngeal mask airway at altitude.

    Science.gov (United States)

    Wilson, Grant D; Sittig, Steven E; Schears, Gregory J

    2008-02-01

    The Laryngeal Mask Airway (LMA) is an accepted adjunct for airway management in emergency patients. There are a number of case reports describing its use in transport medicine for infant to adult patients, including during flight. Although studies of the effect altitude has on air-filled tracheal tubes exists, we were unable to find documentation of the effect of altitude on laryngeal mask airways. Our objective was to assess the effect of altitude on the LMA in both fixed wing and rotary wing models. We performed an in vitro study of the effect of altitude on the LMA cuff. Infant and adult airway trainer mannequins with properly sized and inserted LMA-Classic laryngeal mask airways were monitored for cuff pressure changes while flown at altitudes commonly encountered during air medical transport. Both models demonstrated that LMA cuff pressures may exceed manufacturer recommended levels for safe use even at the relatively low altitudes experienced during rotor wing flight. Properly inserted and inflated laryngeal mask airways at ground level may result in overinflated LMA cuffs when flown to altitudes commonly used for rotor and fixed wing medical transport unless monitored and corrected.

  7. Posleslovije k "Zolotoi maske" / Boris Tuch

    Index Scriptorium Estoniae

    Tuch, Boris, 1946-

    2005-01-01

    Vene draamafestivali "Kuldne mask Eestis" lavastusest : "September.doc", lav. Mihhail Ugarov, I. Võrõpajevi "Hapnik" lav. Viktor Rõzhakov Teatr.doc esituses, Sophoklese "Kuningas Oidipus" lav. Andrei Prikotenko Peterburi Teatri Liteinõi esituses, M. Ugarovi lavastus "OblomOFF"

  8. Testing Tactile Masking between the Forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2016-02-10

    Masking, in which one stimulus affects the detection of another, is a classic technique that has been used in visual, auditory, and tactile research, usually using stimuli that are close together to reveal local interactions. Masking effects have also been demonstrated in which a tactile stimulus alters the perception of a touch at a distant location. Such effects can provide insight into how components of the body's representations in the brain may be linked. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at corresponding contralateral locations. To explore the matching of corresponding points across the body, we can measure the spatial tuning and effect of posture on contralateral masking. Careful controls are required to rule out direct effects of the remote stimulus, for example by mechanical transmission, and also attention effects in which thresholds may be altered by the participant's attention being drawn away from the stimulus of interest. The use of this technique is beneficial as a behavioural measure for exploring which parts of the body are functionally connected and whether the two sides of the body interact in a somatotopic representation. This manuscript describes a behavioural protocol that can be used for studying contralateral tactile masking.

  9. Chromium Contamination in Army Face Masks.

    Science.gov (United States)

    1989-01-01

    containing carbon particles by inhalation when wearing face masks. Other potential health effects are chrome allergies and nonneoplastic lesions of...chronic inflammation—have been reported in chrome -platers and other workers exposed to aerosols of chromium (VI) compounds. Chronic pharyngitis...monochromates and dichromates of sodium, potassium , ammonium, lithium, cesium, and rubidium. ACGIH includes chromium in its list of known human

  10. TASTE MASKING IN PHARMACEUTICAL: AN UPDATE

    Directory of Open Access Journals (Sweden)

    Srivastava Saurabh

    2012-08-01

    Full Text Available Taste is an important factor in the development of dosage form. Nevertheless it is that arena of product development that has been overlooked and undermined for its importance. The problem of bitter and obnoxious taste of is a challenge to the pharmacist in the present scenario. Taste is an important parameter governing compliance. Several oral pharmaceuticals and bulking agents have unpleasant, bitter-tasting components. In numerous cases, the bitter taste modality is an undesirable trait of the product or formulations and can considerably affect its acceptability by consumers. Bitter characteristics found in such systems have been eliminated or minimized by various known processes, but no universally applicable technology for bitterness inhibition has ever been recognized. The desire of improved palatability in these products has prompted the development of numerous formulations with improved performance and acceptability Taste masking technologies offer a great scope for invention and patents. Several approaches like adding flavors and sweeteners, use of coating polymers for inhibiting bitterness, microencapsulation, prodrug formation, formation of inclusion and molecular complexes, solid dispersion system, addition of effervescent agents and application of ion exchange resins have been tried by the formulators to mask the unpleasant taste of the bitter drugs. The present review attempts to give a brief account of different technologies of taste masking with respect to dosage form and novel methods of evaluation of taste masking effect.

  11. Mask cycle time reduction for foundry projects

    Science.gov (United States)

    Balasinski, A.

    2011-11-01

    One of key deliverables of foundry based manufacturing is low cycletime. Building new and enhancing existing products by mask changes involves significant logistical effort, which could be reduced by standardizing data management and communication procedures among design house, mask shop, and foundry (fab) [1]. As an example, a typical process of taping out can take up to two weeks in addition to technical effort, for database handling, mask form completion, management approval, PO signoff and JDV review, translating into loss of revenue. In order to reduce this delay, we are proposing to develop a unified online system which should assist with the following functions: database edits, final verifications, document approvals, mask order entries, and JDV review with engineering signoff as required. This would help a growing number of semiconductor products to be flexibly manufactured at different manufacturing sites. We discuss how the data architecture based on a non-relational database management system (NRDMBS) extracted into a relational one (RDMBS) should provide quality information [2], to reduce cycle time significantly beyond 70% for an example 2 week tapeout schedule.

  12. Masked object registration in the Fourier domain.

    Science.gov (United States)

    Padfield, Dirk

    2012-05-01

    Registration is one of the most common tasks of image analysis and computer vision applications. The requirements of most registration algorithms include large capture range and fast computation so that the algorithms are robust to different scenarios and can be computed in a reasonable amount of time. For these purposes, registration in the Fourier domain using normalized cross-correlation is well suited and has been extensively studied in the literature. Another common requirement is masking, which is necessary for applications where certain regions of the image that would adversely affect the registration result should be ignored. To address these requirements, we have derived a mathematical model that describes an exact form for embedding the masking step fully into the Fourier domain so that all steps of translation registration can be computed efficiently using Fast Fourier Transforms. We provide algorithms and implementation details that demonstrate the correctness of our derivations. We also demonstrate how this masked FFT registration approach can be applied to improve the Fourier-Mellin algorithm that calculates translation, rotation, and scale in the Fourier domain. We demonstrate the computational efficiency, advantages, and correctness of our algorithm on a number of images from real-world applications. Our framework enables fast, global, parameter-free registration of images with masked regions.

  13. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  14. Masks, Performing Traditions, and Cultural Diversity: Exploring African Culture through African Masks.

    Science.gov (United States)

    Cotto-Escalera, Brenda L.

    1991-01-01

    Explores the mask and masquerade traditions, focusing specifically on African culture as a source of exciting and varied materials that can help theater arts teachers and specialists who are in search of culturally diverse materials. Offers a classroom application. (PRA)

  15. Green binary and phase shifting mask

    Science.gov (United States)

    Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang

    2009-12-01

    SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).

  16. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  17. Task-Dependent Masked Priming Effects in Visual Word Recognition

    OpenAIRE

    Sachiko eKinoshita; Dennis eNorris

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal...

  18. Effects of the combination of mask preconditioning with midazolam pretreatment on anxiety and mask acceptance during pediatric inhalational induction and postoperative mask fear in children

    Institute of Scientific and Technical Information of China (English)

    LAN Yun-ping; HUANG Zhen-hua; G.Allen Finley; ZUO Yun-xia

    2012-01-01

    Background Anxiety and fear frequently causes an aversion to applying a face mask and increases difficulty during pediatric induction.There is at present little study of this problem.Therefore,the aim of this study was to investigate the effect of the combination of mask preconditioning and midazolam pretrealment on mask acceptance during pediatric induction and on postoperative mask fear.Methods One hundred and sixty children were randomly assigned into four groups:the mask preconditioning group (MaG),the midazolam pretreatment group (MiG),the mask/midazolam combination group (Ma/MiG),and the saline group (SaG).The Modified Yale Preoperative Anxiety Scale (m-YPAS) was employed to assess the anxiety in the operation room (OR).A Mask Acceptance Score (MAS) was measured during inhalational induction and the incidence of mask fear (MAS ≤2) was evaluated postoperatively.Results The MaG and Ma/MiG groups had the highest mask acceptance scores but there were no differences between these two groups (P <0.05).The average anxiety level of children entering the OR was much lower in the MaG and Ma/MiG groups than in the SaG group (P <0.05).During induction,the anxiety level increased in the SaG and MaG groups but decreased in the MiG and Ma/MiG groups (P <0.05).At the postoperative third day,the incidence of mask fears was as high as 23% in the SaG group,15% in the MiG group,but only 2.5% in the MaG and Ma/MiG groups.Conclusions The single use of mask preconditioning has a better influence than midazolam for increasing mask acceptance during inhalational induction and reducing postoperative mask fear,reducing the anxiety level during induction,improving induction compliance and shortening the total mask time.A mask preconditioning and midazolam combination did not increase mask acceptance during inhalational induction,reduce mask fears postoperatively,improve induction compliance,nor shorten the total mask time.But it can better reduce the anxiety level during

  19. A mask for delivery of inhalation gases to small laboratory animals.

    Science.gov (United States)

    Levy, D E; Zwies, A; Duffy, T E

    1980-10-01

    A mask was developed for the administration of volatile anesthetics and other gases to small, spontaneously breathing laboratory animals. A vacuum-powered venting system surrounding the inspiratory gas supply prevented potentially hazardous gases from escaping into the environment. This system was used to deliver nitrous oxide, halothane, and methoxyflurane to rats, gerbils, and newborn dogs. It was used to vary the oxygen and carbon dioxide concentrations inspired by spontaneously breathing animals undergoing physiological experiments.

  20. Does "Darkness" Lead to "Happiness"? Masked Suffix Priming Effects

    Science.gov (United States)

    Dunabeitia, Jon Andoni; Perea, Manuel; Carreiras, Manuel

    2008-01-01

    Masked affix priming effects have usually been obtained for words sharing the initial affix (e.g., "reaction"-"REFORM"). However, prior evidence on masked suffix priming effects (e.g., "baker"-"WALKER") is inconclusive. In the present series of masked priming lexical decision experiments, a target word was…

  1. How color, regularity, and good Gestalt determine backward masking.

    Science.gov (United States)

    Sayim, Bilge; Manassi, Mauro; Herzog, Michael

    2014-06-18

    The strength of visual backward masking depends on the stimulus onset asynchrony (SOA) between target and mask. Recently, it was shown that the conjoint spatial layout of target and mask is as crucial as SOA. Particularly, masking strength depends on whether target and mask group with each other. The same is true in crowding where the global spatial layout of the flankers and target-flanker grouping determine crowding strength. Here, we presented a vernier target followed by different flanker configurations at varying SOAs. Similar to crowding, masking of a red vernier target was strongly reduced for arrays of 10 green compared with 10 red flanking lines. Unlike crowding, single green lines flanking the red vernier showed strong masking. Irregularly arranged flanking lines yielded stronger masking than did regularly arranged lines, again similar to crowding. While cuboid flankers reduced crowding compared with single lines, this was not the case in masking. We propose that, first, masking is reduced when the flankers are part of a larger spatial structure. Second, spatial factors counteract color differences between the target and the flankers. Third, complex Gestalts, such as cuboids, seem to need longer processing times to show ungrouping effects as observed in crowding. Strong parallels between masking and crowding suggest similar underlying mechanism; however, temporal factors in masking additionally modulate performance, acting as an additional grouping cue. © 2014 ARVO.

  2. Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction

    Science.gov (United States)

    Hagiwara, Kazuyuki; Bork, Ingo; Fujimura, Aki

    2011-05-01

    Using Model-Based Mask Data Preparation (MB-MDP) complex masks with complex sub-resolution assist features (SRAFs) can be written in practical write times with today's leading-edge production VSB machines by allowing overlapping VSB shots. This simulation-based approach reduces shot count by taking advantage of the added flexibility in being able to overlap shots. The freedom to overlap shots, it turns out, also increases mask fidelity, CDU on the mask, and CDU on the wafer by writing sub-100nm mask features more accurately, and with better dose margin. This paper describes how overlapping shots enhance mask and wafer quality for various sub-100nm features on ArF masks. In addition, this paper describes how EUV mask accuracy can be enhanced uniquely by allowing overlapping shots.

  3. ILT Approach for Compensating 3-D Mask Effects

    Institute of Scientific and Technical Information of China (English)

    XIONG Wei; ZHANG Jinyu; MinChun; WANG Yan; YU Zhiping

    2009-01-01

    As mask features scale to smaller dimensions,the so-called "3-D mask effects" which have mostly been neglected before,become important.This paper properly models the 3-D thick mask effects,and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results.Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94,and this approach gives improved accuracy and faster results than existing methods.

  4. The Fastest Saccadic Responses Escape Visual Masking

    DEFF Research Database (Denmark)

    M. Crouzet, Sébastien; Overgaard, Morten; Busch, Niko A.

    2014-01-01

    , which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference......Object-substitution masking (OSM) occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. The reduction of target visibility occurring after OSM has been suggested to result from a specific interference with reentrant...... visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task...

  5. Reduced basis method for source mask optimization

    CERN Document Server

    Pomplun, J; Burger, S; Schmidt, F; Tyminski, J; Flagello, D; Toshiharu, N; 10.1117/12.866101

    2010-01-01

    Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational lithography. SMO is considered essential to extending immersion lithography beyond the 45nm node. However, SMO is computationally extremely challenging and time-consuming. The key challenges are due to run time vs. accuracy tradeoffs of the imaging models used for the computational lithography. We present a new technique to be incorporated in the SMO flow. This new approach is based on the reduced basis method (RBM) applied to the simulation of light transmission through the lithography masks. It provides a rigorous approximation to the exact lithographical problem, based on fully vectorial Maxwell's equations. Using the reduced basis method, the optimization process is divided into an offline and an online steps. In the offline step, a RBM model with variable geometrical param...

  6. Multi-part mask for implanting workpieces

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.

    2016-05-10

    A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.

  7. Masking mediated print defect visibility predictor

    Science.gov (United States)

    Jing, Xiaochen; Nachlieli, Hila; Shaked, Doron; Shiffman, Smadar; Allebach, Jan P.

    2012-01-01

    Banding is a well-known artifact produced by printing systems. It usually appears as lines perpendicular to the process direction of the print. Therefore, banding is an important print quality issue which has been analyzed and assessed by many researchers. However, little literature has focused on the study of the masking effect of content for this kind of print quality issue. Compared with other image and print quality research, our work is focused on the print quality of typical documents printed on a digital commercial printing press. In this paper, we propose a Masking Mediated Print Defect Visibility Predictor (MMPDVP) to predict the visibility of defects in the presence of customer content. The parameters of the algorithm are trained from ground-truth images that have been marked by subjects. The MMPDVP could help the press operator decide whether the print quality is acceptable for specific customer requirements. Ultimately, this model can be used to optimize the print-shop workflow.

  8. Latent inhibition in human adults without masking.

    Science.gov (United States)

    Escobar, Martha; Arcediano, Francisco; Miller, Ralph R

    2003-09-01

    Latent inhibition refers to attenuated responding to Cue X observed when the X-outcome pairings are preceded by X-alone presentations. It has proven difficult to obtain in human adults unless the preexposure (X-alone) presentations are embedded within a masking (i.e., distracting) task. The authors hypothesized that the difficulty in obtaining latent inhibition with unmasked tasks is related to the usual training procedures, in which the preexposure and conditioning experiences are separated by a set of instructions. Experiment 1 reports latent inhibition without masking in a task in which preexposure and conditioning occur without interruption. Experiments 2 and 3 demonstrate that this attenuation in responding to target Cue X does not pass a summation test for conditioned inhibition and is context specific, thereby confirming that it is latent inhibition. Experiments 3 and 4 confirm that introducing instructions between preexposure and conditioning disrupts latent inhibition.

  9. Contrast Gain Control Model Fits Masking Data

    Science.gov (United States)

    Watson, Andrew B.; Solomon, Joshua A.; Null, Cynthia H. (Technical Monitor)

    1994-01-01

    We studied the fit of a contrast gain control model to data of Foley (JOSA 1994), consisting of thresholds for a Gabor patch masked by gratings of various orientations, or by compounds of two orientations. Our general model includes models of Foley and Teo & Heeger (IEEE 1994). Our specific model used a bank of Gabor filters with octave bandwidths at 8 orientations. Excitatory and inhibitory nonlinearities were power functions with exponents of 2.4 and 2. Inhibitory pooling was broad in orientation, but narrow in spatial frequency and space. Minkowski pooling used an exponent of 4. All of the data for observer KMF were well fit by the model. We have developed a contrast gain control model that fits masking data. Unlike Foley's, our model accepts images as inputs. Unlike Teo & Heeger's, our model did not require multiple channels for different dynamic ranges.

  10. Extreme ultraviolet lithography: reflective mask technology

    Science.gov (United States)

    Walton, Christopher C.; Kearney, Patrick A.; Mirkarimi, Paul B.; Bowers, Joel M.; Cerjan, Charles J.; Warrick, Abbie L.; Wilhelmsen, Karl C.; Fought, Eric R.; Moore, Craig E.; Larson, Cindy C.; Baker, Sherry L.; Burkhart, Scott C.; Hector, Scott D.

    2000-07-01

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7 nm-pitch bi-layers of Mo and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150 mm substrates, it was upgraded in July 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects > 100 nm below 0.05/cm2. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross- platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  11. Nablus mask-like facial syndrome

    DEFF Research Database (Denmark)

    Allanson, Judith; Smith, Amanda; Hare, Heather

    2012-01-01

    Nablus mask-like facial syndrome (NMLFS) has many distinctive phenotypic features, particularly tight glistening skin with reduced facial expression, blepharophimosis, telecanthus, bulky nasal tip, abnormal external ear architecture, upswept frontal hairline, and sparse eyebrows. Over the last few...... heterozygous deletions significantly overlapping the region associated with NMLFS. Notably, while one mother and child were said to have mild tightening of facial skin, none of these individuals exhibited reduced facial expression or the classical facial phenotype of NMLFS. These findings indicate...

  12. Masking a Compact AES S-box

    Science.gov (United States)

    2007-08-07

    Lecture Notes in Computer Science , pages 309–18, 2001. [2] D. Canright. A very compact S-box for AES. In CHES2005, volume 3659 of Lecture Notes in Computer Science , pages...et al., editor, CHES2003, volume 2779 of Lecture Notes in Computer Science , pages 319–333. Springer, 2003. [4] Jovan Dj. Golić and Christophe Tymen...Multiplicative masking and power analysis of AES. In CHES 2002, volume 2523 of Lecture

  13. Extreme Ultraviolet Lithography - Reflective Mask Technology

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  14. Nanoparticle and nanosphere mask for etching of ITO nanostructures and their reflection properties

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Cigang; Deng, Ligang; Holder, Adam; Bailey, Louise R.; Proudfoot, Gary; Thomas, Owain; Gunn, Robert; Cooke, Mike [Oxford Instruments Plasma Technology, Bristol (United Kingdom); Leendertz, Caspar [Helmholtz-Zentrum Berlin fuer Materialien und Energie, Institut fuer Silizium Photovoltaik, Berlin (Germany); Bergmann, Joachim [Leibniz Institute of Photonic Technology, Jena (Germany)

    2015-01-01

    Au nanoparticles and polystyrene nanospheres were used as mask for plasma etching of indium tin oxide (ITO) layer. By reactive ion etching (RIE) processes, the morphology of polystyrene nanospheres can be tuned through chemical or physical etching, and Au nanoparticle mask can result in ITO nanostructures with larger aspect ratio than nanosphere mask. During inductively coupled plasma (ICP) processes, Au nanoparticle mask was not affected by the thermal effect of plasma, whereas temperature of the substrate was essential to protect nanospheres from the damaging effect of plasma. Physical bombardment in the plasma can also modify the nanospheres. It was observed that under the same process conditions, the ratio of CH{sub 4} and H{sub 2} in the process gas can affect the etching rate of ITO without completely etching the nanospheres. The morphology of ITO nanostructures also depends on process conditions. The resulting ITO nanostructures show lower reflection in a spectral range of 400-1000 nm than c-Si and conventional antireflection layer of SiN{sub x} film. ITO nanostructures obtained after etching (scale bar = 200 nm). (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. Mask image position correction for double patterning lithography

    Science.gov (United States)

    Saito, Masato; Itoh, Masamitsu; Ikenaga, Osamu; Ishigo, Kazutaka

    2008-05-01

    Application of double patterning technique has been discussed for lithography of HP 3X nm device generation. In this case, overlay budget for lithography becomes so hard that it is difficult to achieve it with only improvement of photomask's position accuracy. One of the factors of overlay error will be induced by distortion of photomask after chucking on the mask stage of exposure tool, because photomasks are bended by the force of vacuum chucking. Recently, mask flatness prediction technique was developed. This technique is simulating the surface shape of mask when it is on the mask stage by using the flatness data of free-standing state blank and the information of mask chucking stage. To use this predicted flatness data, it is possible to predict a pattern position error after exposed and it is possible to correct it on the photomask. A blank supplier developed the flatness data transfer system to mask vender. Every blanks are distinguished individually by 2D barcode mark on blank which including serial number. The flatness data of each blank is linked with this serial number, and mask vender can use this serial number as a key code to mask flatness data. We developed mask image position correction system by using 2D barcode mark linked to predicted flatness data, and position accuracy assurance system for these masks. And with these systems, we made some masks actually.

  16. Dose masking feature for BNCT radiotherapy planning

    Science.gov (United States)

    Cook, Jeremy L.; Wessol, Daniel E.; Wheeler, Floyd J.

    2000-01-01

    A system for displaying an accurate model of isodoses to be used in radiotherapy so that appropriate planning can be performed prior to actual treatment on a patient. The nature of the simulation of the radiotherapy planning for BNCT and Fast Neutron Therapy, etc., requires that the doses be computed in the entire volume. The "entire volume" includes the patient and beam geometries as well as the air spaces in between. Isodoses derived from the computed doses will therefore extend into the air regions between the patient and beam geometries and thus depict the unrealistic possibility that radiation deposition occurs in regions containing no physical media. This problem is solved by computing the doses for the entire geometry and then masking the physical and air regions along with the isodose contours superimposed over the patient image at the corresponding plane. The user is thus able to mask out (remove) the contour lines from the unwanted areas of the image by selecting the appropriate contour masking region from the raster image.

  17. Direct 3D printed shadow mask on Silicon

    Science.gov (United States)

    Rahiminejad, S.; Köhler, E.; Enoksson, P.

    2016-10-01

    A 3D printed shadow mask method is presented. The 3D printer prints ABS plastic directly on the wafer, thus avoiding gaps between the wafer and the shadow mask, and deformation during the process. The wafer together with the 3D printed shadow mask was sputtered with Ti and Au. The shadow mask was released by immersion in acetone. The sputtered patches through the shadow mask were compared to the opening of the 3D printed shadow mask and the design dimensions. The patterned Au patches were larger than the printed apertures, however they were smaller than the design widths. The mask was printed in 4 min, the cost is less than one euro cent, and the process is a low temperature process suitable for temperature sensitive components.

  18. Mask design rules (45 nm): time for standardization

    Science.gov (United States)

    Mason, Mark; Progler, Christopher J.; Martin, Patrick; Ham, Young-Mog; Dillon, Brian; Pack, Robert; Heins, Mitch; Gookassian, John; Garcia, John; Boksha, Victor

    2005-11-01

    Time-to-mask (ttm) has been growing exponentially in the subwavelength era with the increased application of advanced RET's (Resolution Enhancement Technology). Not only are a greater number of design/mask layers impacted but more-and-more layers also have more severe restrictions on critical dimension uniformity (CDU) despite operating at a very low k1 factors necessitating rigorous but practical tolerancing. Furthermore, designs are also more complex, may be built up from blocks spanning different design styles, and occupy increasingly-large Rayleigh field areas. Given these factors and scales, it's no wonder that the cycle time for verification of a design following RET, is growing however it is doing so exponentially and that this is a critical factor impeding ttm. Until an unambiguously interprable and standard Mask Design Rule (MaskDR) set is created, neither the designer nor the mask supplier can reliably verify manufacturability of the mask for the simple reason that ambiguity and inter-rule conflict are at the source of the problem and that the problem increasingly requires cooperation spanning a large ecosystem of tool, IP, and mask suppliers all needing to essentially speak the same language. Since the 130 nm node, Texas Instruments has enforced a strict set of mask rule checks (MRCs) in their mask data preparation (MDP) flow based on MaskDRs negotiated with their mask suppliers. The purpose of this effort has been to provide an a-priori guarantee that the data shipped to the mask shop can be used to manufacture a mask reliably and with high yield both from a mask standpoint and from the silicon standpoint. As has been reported earlier, mask manufacturing rules are usually determined from assumed or experimentally acquired/validated mask-manufacturing limits. These rules are then applied during RET/MDP data treatment to guide and/or limit pattern correction strategies. With increasing RET and low-k1 lithography challenges, the importance of MRCs

  19. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  20. The masked priming toolbox: an open-source MATLAB toolbox for masked priming researchers.

    Science.gov (United States)

    Wilson, Andrew D; Tresilian, James; Schlaghecken, Friederike

    2011-03-01

    The Masked Priming Toolbox is an open-source collection of MATLAB functions that utilizes the free third-party PsychToolbox-3 (PTB3: Brainard, Spatial Vision, 10, 433-436, 1997; Kleiner, Brainard & Pelli, Perception, 36, 2007; Pelli, Spatial Vision, 10, 437-442, 1997). It is designed to allow a researcher to run masked (and unmasked) priming experiments using a variety of response devices (including keyboards, graphics tablets and force transducers). Very little knowledge of MATLAB is required; experiments are generated by creating a text file with the required parameters, and raw and analyzed data are output to Excel (as well as MATLAB) files for further analysis. The toolbox implements a variety of stimuli for use as primes and targets, as well as a variety of masks. Timing, size, location, and orientation of stimuli are all parameterizable. The code is open-source and made available on the Web under a Creative Commons License.

  1. Noninvasive CPAP with face mask: comparison among new air-entrainment masks and the Boussignac valve.

    Science.gov (United States)

    Mistraletti, Giovanni; Giacomini, Matteo; Sabbatini, Giovanni; Pinciroli, Riccardo; Mantovani, Elena S; Umbrello, Michele; Palmisano, Debora; Formenti, Paolo; Destrebecq, Anne L L; Iapichino, Gaetano

    2013-02-01

    The performances of 2 noninvasive CPAP systems (high flow and low flow air-entrainment masks) were compared to the Boussignac valve in 3 different scenarios. Scenario 1: pneumatic lung simulator with a tachypnea pattern (tidal volume 800 mL at 40 breaths/min). Scenario 2: Ten healthy subjects studied during tidal breaths and tachypnea. Scenario 3: Twenty ICU subjects enrolled for a noninvasive CPAP session. Differences between set and effective CPAP level and F(IO(2)), as well as the lowest airway pressure and the pressure swing around the imposed CPAP level, were analyzed. The lowest airway pressure and swing were correlated to the pressure-time product (area of the airway pressure curve below the CPAP level) measured with the simulator. P(aO(2)) was a subject's further performance index. Lung simulator: Boussignac F(IO(2)) was 0.54, even if supplied with pure oxygen. The air-entrainment masks had higher swing than the Boussignac (P = .007). Pressure-time product correlated better with pressure swing (Spearman correlation coefficient [ρ] = 0.97) than with lowest airway pressure (ρ = 0.92). In healthy subjects, the high-flow air-entrainment mask showed lower difference between set and effective F(IO(2)) (P high-flow mask had lower swing than the Boussignac valve (P = .03) with similar P(aO(2)) increase. High-flow air-entrainment mask showed the best performance in human subjects. During high flow demand, the Boussignac valve delivered lower than expected F(IO(2)) and showed higher dynamic hyper-pressurization than the air-entrainment masks. © 2013 Daedalus Enterprises.

  2. Strategy optimization for mask rule check in wafer fab

    Science.gov (United States)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  3. Mask data volume: historical perspective and future requirements

    Science.gov (United States)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell; Preuninger, Jürgen; Griesinger, Üwe; Blöcker, Martin

    2006-06-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor, DRAM and Flash memory designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  4. Source mask optimization using 3D mask and compact resist models

    Science.gov (United States)

    El-Sewefy, Omar; Chen, Ao; Lafferty, Neal; Meiring, Jason; Chung, Angeline; Foong, Yee Mei; Adam, Kostas; Sturtevant, John

    2016-03-01

    Source Mask Optimization (SMO) has played an important role in technology setup and ground rule definition since the 2x nm technology node. While improvements in SMO algorithms have produced higher quality and more consistent results, the accuracy of the overall solution is critically linked to how faithfully the entire patterning system is modeled, from mask down to substrate. Fortunately, modeling technology has continued to advance to provide greater accuracy in modeling 3D mask effects, 3D resist behavior, and resist phenomena. Specifically, the Domain Decomposition Method (DDM) approximates the 3D mask response as a superposition of edge-responses.1 The DDM can be applied to a sectorized illumination source based on Hybrid-Hopkins Abbe approximation,2 which provides an accurate and fast solution for the modeling of 3D mask effects and has been widely used in OPC modeling. The implementation of DDM in the SMO flow, however, is more challenging because the shape and intensity of the source, unlike the case in OPC modeling, is evolving along the optimization path. As a result, it gets more complicated. It is accepted that inadequate pupil sectorization results in reduced accuracy in any application, however in SMO the required uniformity and density of pupil sampling is higher than typical OPC and modeling cases. In this paper, we describe a novel method to implement DDM in the SMO flow. The source sectorization is defined by following the universal pixel sizes used in SMO. Fast algorithms are developed to enable computation of edge signals from each fine pixel of the source. In this case, each pixel has accurate information to describe its contribution to imaging and the overall objective function. A more continuous angular spectrum from 3D mask scattering is thus captured, leading to accurate modeling of 3D mask effects throughout source optimization. This method is applied on a 2x nm middle-of-line layer test case. The impact of the 3D mask model accuracy on

  5. Women and trauma: transformation of self through mask making and action-based mask work

    OpenAIRE

    Birch, June Elizabeth

    2011-01-01

    This secondary analysis study examined the stories of six women who were impacted by trauma. These women attended a ten-week counselling group in which they participated in the construction of masks and in action-based mask work as a means of expressing and working through their trauma experiences. Based on a constructivist approach, the methodology employed in this study was a narrative inquiry centred on the work of Lieblich, Tuval-Mashiach, and Zilber (1998). The data were generated from o...

  6. Practical use of the repeating patterns in mask writing

    Science.gov (United States)

    Shoji, Masahiro; Inoue, Tadao; Yamabe, Masaki

    2010-03-01

    In May 2006, the Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched a 4-year program for reducing mask manufacturing cost and TAT by concurrent optimization of MDP, mask writing, and mask inspection. As one of the tasks being pursued at the Mask Design Data Technology Research Laboratory, we have evaluated the effect of reducing the drawing shot counts by utilizing the repeating patterns, and showed positive impact on mask making by using CP drawing. During the past four years, we have developed a software to extract repeating patterns from fractured OPCed mask data which can be used to minimize the shot counts. In this evaluation, we have used an actual device production data obtained from the member companies of MaskD2I. To the extraction software we added new functions for extracting common repeating patterns from a set of multiple masks, and studied how this step can reduce the counts in comparison to the shot counts required during the conventional mask writing techniques. We have also developed software that uses the extraction result of repeating patterns and prepares drawing-data for the MCC/CP drawing system, which has been developed at the Mask Writing Equipment Technology Research Laboratory. With this software, we have simulated EB proximity effect on CP writing and examined how it affect the shot count reduction where CP shots with large CD errors are to be divided into VSB shots. In this paper, we will report the evaluation result of the practical application of repeating patterns in mask writing with this software.

  7. Generic hierarchical engine for mask data preparation

    Science.gov (United States)

    Kalus, Christian K.; Roessl, Wolfgang; Schnitker, Uwe; Simecek, Michal

    2002-07-01

    Electronic layouts are usually flattened on their path from the hierarchical source downstream to the wafer. Mask data preparation has certainly been identified as a severe bottleneck since long. Data volumes are not only doubling every year along the ITRS roadmap. With the advent of optical proximity correction and phase-shifting masks data volumes are escalating up to non-manageable heights. Hierarchical treatment is one of the most powerful means to keep memory and CPU consumption in reasonable ranges. Only recently, however, has this technique acquired more public attention. Mask data preparation is the most critical area calling for a sound infrastructure to reduce the handling problem. Gaining more and more attention though, are other applications such as large area simulation and manufacturing rule checking (MRC). They all would profit from a generic engine capable to efficiently treat hierarchical data. In this paper we will present a generic engine for hierarchical treatment which solves the major problem, steady transitions along cell borders. Several alternatives exist how to walk through the hierarchy tree. They have, to date, not been thoroughly investigated. One is a bottom-up attempt to treat cells starting with the most elementary cells. The other one is a top-down approach which lends itself to creating a new hierarchy tree. In addition, since the variety, degree of hierarchy and quality of layouts extends over a wide range a generic engine has to take intelligent decisions when exploding the hierarchy tree. Several applications will be shown, in particular how far the limits can be pushed with the current hierarchical engine.

  8. Early diagnosis of masked hypertension in adolescents

    Directory of Open Access Journals (Sweden)

    Ledyaev M.Ya.

    2016-12-01

    Full Text Available Objective: to improve diagnosis of latent arterial hypertension by studying the characteristics of hemodynamics and the rigidity of the vascular walls of the arteries in adolescents with this phenomenon. Material and Methods. The study involved 147 children aged 11 to 18 years who did not have heart rhythm disorders, congenital heart defects, endocrine diseases and diseases of the kidneys. They were divided into three groups on the basis of blood pressure values (BP obtained during three measurements of blood pressure according to the method of N. S. Korotkov and when conducting 24-hours ambulatory blood pressure monitoring (ABPM. Group 1 included children with blood pressure values in the range from 5 to 95 percentile. Group 2 was composed children with masked hypertension (values of office blood pressure in the range from 5 to 95 percentile but indicators of ABPM of blood pressure is greater than 95 percentile. Group 3 included children with stable arterial hypertension (blood pressure values exceeded the 95 percentile. The study was a comparative analysis of the hemodynamic and rigidity (stiffness of the arteries. Results: Most hemodynamic parameters in children with masked hypertension were higher than in children of group 1. However, these figures were lower than in children with stable arterial hypertension. Among the indicators of the rigidity of the arteries, the most sensitive indicator (dP/dt max was maximum rate of pressure rise. Children with masked hypertension had increased arterial stiffness, however it was lower than in children with stable arterial hypertension. Conclusion: The use of BPLab monitor with technology Vasotens allows physicians to evaluate the daily profile of arterial pressure, the hemodynamics and stiffness of blood vessels, which is an important step for early diagnostics of latent arterial hypertension in children

  9. Masking properties of ceramics for veneer restorations.

    Science.gov (United States)

    Skyllouriotis, Andreas L; Yamamoto, Hideo L; Nathanson, Dan

    2017-10-01

    The translucency and opacity of ceramics play a significant role in emulating the natural color of teeth, but studies of the masking properties and limitations of dental ceramics when used as monolayer restorations are lacking. The purpose of this in vitro study was to determine the translucency of 6 materials used for veneer restorations by assessing their translucency parameters (TPs), contrast ratios (CRs), and potential to mask dark tooth colors. Ten square- or disk-shaped specimens (0.5-mm thickness, shade A2) were fabricated from Vitablocks Mark II (VMII; Vita Zahnfabrik), IPS e.max CAD LT (EMXC LT; Ivoclar Vivadent AG), IPS e.max CAD HT (EMXC HT; Ivoclar Vivadent AG), IPS Empress CAD LT (EMP LT; Ivoclar Vivadent AG), IPS e.max Press LT (EMXP LT; Ivoclar Vivadent AG), and CZR (CZR; Kuraray Noritake Dental Inc). Their luminance (Y) values over black and over white tiles were measured, followed by their color (CIELab) over black tiles and white tiles and shaded A2 (control group), A3.5, A4, and B4 acrylic resin blocks. All measurements were performed using a spectrophotometer in 2 different areas on each specimen. Then CRs, TPs, and color differences (over shaded backgrounds) were determined. Data were subjected to 1-way and 2-way ANOVA (α=.05) for analysis. Mean CR values of EMXP LT were significantly higher than those of the other tested materials, whereas VMII and EMXC HT had the lowest values (Pceramic materials, whereas shade B4 demonstrated the lowest mean background effect (Pceramics were revealed (Pceramics exhibited poor masking properties against the A4 background. The color differences of most tested ceramics were more acceptable when tested against the B4 background (ΔE*≤3.3). Copyright © 2016 Editorial Council for the Journal of Prosthetic Dentistry. Published by Elsevier Inc. All rights reserved.

  10. Crowding is unlike ordinary masking: distinguishing feature integration from detection.

    Science.gov (United States)

    Pelli, Denis G; Palomares, Melanie; Majaj, Najib J

    2004-12-30

    A letter in the peripheral visual field is much harder to identify in the presence of nearby letters. This is "crowding." Both crowding and ordinary masking are special cases of "masking," which, in general, refers to any effect of a "mask" pattern on the discriminability of a signal. Here we characterize crowding, and propose a diagnostic test to distinguish it from ordinary masking. In ordinary masking, the signal disappears. In crowding, it remains visible, but is ambiguous, jumbled with its neighbors. Masks are usually effective only if they overlap the signal, but the crowding effect extends over a large region. The width of that region is proportional to signal eccentricity from the fovea and independent of signal size, mask size, mask contrast, signal and mask font, and number of masks. At 4 deg eccentricity, the threshold contrast for identification of a 0.32 deg signal letter is elevated (up to six-fold) by mask letters anywhere in a 2.3 deg region, 7 times wider than the signal. In ordinary masking, threshold contrast rises as a power function of mask contrast, with a shallow log-log slope of 0.5 to 1, whereas, in crowding, threshold is a sigmoidal function of mask contrast, with a steep log-log slope of 2 at close spacing. Most remarkably, although the threshold elevation decreases exponentially with spacing, the threshold and saturation contrasts of crowding are independent of spacing. Finally, ordinary masking is similar for detection and identification, but crowding occurs only for identification, not detection. More precisely, crowding occurs only in tasks that cannot be done based on a single detection by coarsely coded feature detectors. These results (and observers' introspections) suggest that ordinary masking blocks feature detection, so the signal disappears, while crowding (like "illusory conjunction") is excessive feature integration - detected features are integrated over an inappropriately large area because there are no smaller integration

  11. Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

    Science.gov (United States)

    Pack, Robert C.; Standiford, Keith; Lukanc, Todd; Ning, Guo Xiang; Verma, Piyush; Batarseh, Fadi; Chua, Gek Soon; Fujimura, Akira; Pang, Linyong

    2014-10-01

    A methodology is described wherein a calibrated model-based `Virtual' Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask designs prior to Mask Data Preparation (MDP) and mask fabrication. This type of verification addresses physical effects which occur in mask writing that may impact lithographic printing fidelity and variability. The work described here is motivated by requirements for extreme accuracy and control of variations for today's most demanding IC products. These extreme demands necessitate careful and detailed analysis of all potential sources of uncompensated error or variation and extreme control of these at each stage of the integrated OPC/ MDP/ Mask/ silicon lithography flow. The important potential sources of variation we focus on here originate on the basis of VSB mask writer physics and other errors inherent in the mask writing process. The deposited electron beam dose distribution may be examined in a manner similar to optical lithography aerial image analysis and image edge log-slope analysis. This approach enables one to catch, grade, and mitigate problems early and thus reduce the likelihood for costly long-loop iterations between OPC, MDP, and wafer fabrication flows. It moreover describes how to detect regions of a layout or mask where hotspots may occur or where the robustness to intrinsic variations may be improved by modification to the OPC, choice of mask technology, or by judicious design of VSB shots and dose assignment.

  12. Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

    Science.gov (United States)

    Emoto, Keiji; Sakai, Fumio; Sato, Chiaki; Takabayashi, Yukio; Nakano, Hitoshi; Takabayashi, Tsuneo; Yamamoto, Kiyohito; Hattori, Tadashi; Hiura, Mitsuru; Ando, Toshiaki; Kawanobe, Yoshio; Azuma, Hisanobu; Iwanaga, Takehiko; Choi, Jin; Aghili, Ali; Jones, Chris; Irving, J. W.; Fletcher, Brian; Ye, Zhengmao

    2016-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. Criteria specific to any lithographic process for the semiconductor industry include overlay, throughput and defectivity. The purpose of this paper is to describe the technology advancements made in the reduction of particle adders in an imprint tool and introduce the new mask replication tool that will enable the fabrication of replica masks with added residual image placement errors suitable for memory devices with half pitches smaller than 15nm. Hard particles on a wafer or mask create the possibility of creating a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, test stand results demonstrate the potential for extending mask life to better than 1000 wafers. Additionally, a new replication tool, the FPA-1100 NR2 is introduced. Mask chuck flatness simulation results were also performed and demonstrate that residual image placement errors can be reduced to as little as 1nm.

  13. EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

    Science.gov (United States)

    Takekoshi, Hidekazu; Nakayama, Takahito; Saito, Kenichi; Ando, Hiroyoshi; Inoue, Hideo; Nakayamada, Noriaki; Kamikubo, Takashi; Nishimura, Rieko; Kojima, Yoshinori; Yashima, Jun; Anpo, Akihito; Nakazawa, Seiichi; Iijima, Tomohiro; Ohtoshi, Kenji; Anze, Hirohito; Katsap, Victor; Golladay, Steven; Kendall, Rodney

    2014-10-01

    In the half pitch (hp) 16nm generation, the shot count on a mask is expected to become bipolar. The multi-patterning technology in lithography seems to maintain the shot count around 300G shots instead of increase in the number of masks needed for one layer. However, as a result of mask multiplication, the better positional accuracy would be required especially in Mask-to-Mask overlay. On the other hand, in complex OPC, the shot count on a mask is expected to exceed 1T shots. In addition, regardless of the shot count forecast, the resist sensitivity needs to be lower to reduce the shot noise effect so as to get better LER. In other words, slow resist would appear on main stream, in near future. Hence, such trend would result in longer write time than that of the previous generations. At the same time, most mask makers request masks to be written within 24 hours. Thus, a faster mask writer with better writing accuracy than those of previous generations is needed. With this background, a new electron beam mask writing system, EBM- 9000, has been developed to satisfy such requirements of the hp 16nm generation. The development of EBM-9000 has focused on improving throughput for larger shot counts and improving the writing accuracy.

  14. Revolution with and without the mask

    Directory of Open Access Journals (Sweden)

    Milanko Vladan

    2010-01-01

    Full Text Available This paper is an attempt to provide a certain “second reading” of those commonplaces which imply that a particular, personal interest always lies behind the mask of objectivity, necessity and truth. As a paradigmatic example of this kind of structure that implies “hidden truths”, here will be taken that of a revolution, whether it is a fascist, a liberal-democratic or a communist revolution. By reexamining how this motif of “truth-behind-the-mask” figures in those regimes, we will try to say something about each of them, and also about the specific kind of subject that is produced under them.

  15. Computer-assisted area detector masking.

    Science.gov (United States)

    Wright, Christopher J; Zhou, Xiao Dong

    2017-03-01

    Area detectors have become the predominant type of detector for the rapid acquisition of X-ray diffraction, small-angle scattering and total scattering. These detectors record the scattering for a large area, giving each shot good statistical significance to the resulting scattered intensity I(Q) pattern. However, many of these detectors have pixel level defects, which cause error in the resulting one-dimensional patterns. In this work, new software to automatically find and mask these dead pixels and other defects is presented. This algorithm is benchmarked with both ideal simulated and experimental datasets.

  16. Silicon germanium mask for deep silicon etching

    KAUST Repository

    Serry, Mohamed

    2014-07-29

    Polycrystalline silicon germanium (SiGe) can offer excellent etch selectivity to silicon during cryogenic deep reactive ion etching in an SF.sub.6/O.sub.2 plasma. Etch selectivity of over 800:1 (Si:SiGe) may be achieved at etch temperatures from -80 degrees Celsius to -140 degrees Celsius. High aspect ratio structures with high resolution may be patterned into Si substrates using SiGe as a hard mask layer for construction of microelectromechanical systems (MEMS) devices and semiconductor devices.

  17. On the relations between crowding and visual masking.

    Science.gov (United States)

    Huckauf, Anke; Heller, Dieter

    2004-05-01

    To study the question of which processes contribute to crowding and whether these are comparable to those of visual temporal masking, we varied the stimulus onset asynchrony (SOA) between target and flankers in a crowding setting. Monotonically increasing Type A masking functions observedfor small spacings and large eccentricities indicate that the integration of information from target and flankers underlies crowding. Decreasing masking functions obtained for large spacings and small eccentricities relate processes of crowding to those contributing to Type B masking. In addition, Type B masking was more frequent with letter-like nonletter flankers than with letter flankers, suggesting that Type B masking, just like crowding over large areas, is due to higher level interactions. The rapid decrease of the effects of interletter spacing and eccentricity with increasing SOA indicates that positional information is transient.

  18. Constellation-masked secure communication technique for OFDM-PON.

    Science.gov (United States)

    Liu, Bo; Zhang, Lijia; Xin, Xiangjun; Yu, Jianjun

    2012-10-22

    This paper proposes a novel secure communication technique using constellation masking for applications in orthogonal frequency division multiplexing passive optical network (OFDM-PON). The constellation masking is applied both on each subcarrier and among different subcarriers. The Arnold mapping is utilized as the parameter function for the mask factors. A interleave length is employed to provide a scalable masking granularity for different ONUs. A 15.54 Gb/s constellation-masked 32QAM-OFDM signal has been successfully transmitted over 25-km single mode fiber in the experiment. Experimental results show that the proposed scheme can effectively protect the system from illegal ONU without wasting the bandwidth. The constellation-masked technique suggests an effective solution for the physical secure communication in future OFDM access network.

  19. Characterizing the monaural and binaural processes underlying reflection masking

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2007-01-01

    Reflection masked thresholds (RMTs) for the simple scenario of a test reflection masked by the direct sound (200 ms long broadband noise) were measured as a function of reflection delay for diotic and dichotic stimulus presentations. In order to discriminate between contributions to reflection...... masking from simultaneous versus forward masking, the simultaneous RMT was measured in addition to the traditional RMT. Simultaneous RM was realized by truncating the offset of the test reflection such that the test reflection and the direct sound had a common offset. By comparing the experimental results...... for the two RMTs, it is shown that forward masking effects only have a significant effect on reflection masking for delays above 7–10 ms. Moreover, binaural mechanisms were revealed which deteriorate auditory detection of test reflections for delays below 7–10 ms and enhance detection for larger delays...

  20. Mask manufacturing improvement through capability definition and bottleneck line management

    Science.gov (United States)

    Strott, Al

    1994-02-01

    In 1989, Intel's internal mask operation limited itself to research and development activities and re-inspection and pellicle application of externally manufactured masks. Recognizing the rising capital cost of mask manufacturing at the leading edge, Intel's Mask Operation management decided to offset some of these costs by manufacturing more masks internally. This was the beginning of the challenge they set to manufacture at least 50% of Intel's mask volume internally, at world class performance levels. The first step in responding to this challenge was the completion of a comprehensive operation capability analysis. A series of bottleneck improvements by focus teams resulted in an average cycle time improvement to less than five days on all product and less than two days on critical products.

  1. Exoplanet Coronagraph Shaped Pupil Masks and Laboratory Scale Star Shade Masks: Design, Fabrication and Characterization

    Science.gov (United States)

    Balasubramanian, Kunjithapatha; White, Victor; Yee, Karl; Echternach, Pierre; Muller, Richard; Dickie, Matthew; Cady, Eric; Mejia Prada, Camilo; Ryan, Daniel; Poberezhskiy, Ilya; hide

    2015-01-01

    Star light suppression technologies to find and characterize faint exoplanets include internal coronagraph instruments as well as external star shade occulters. Currently, the NASA WFIRST-AFTA mission study includes an internal coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host star light to about 10 -9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultra-low reflectivity regions, uniformity, wave front quality, achromaticity, etc. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed (HCIT) at JPL and from the High Contrast Imaging Lab (HCIL) at Princeton University. We also present briefly the technologies applied to fabricate laboratory scale star shade masks.

  2. Volume Phase Masks in Photo-Thermo-Refractive Glass

    Science.gov (United States)

    2014-10-06

    2014 Approved for public release; distribution is unlimited. Volume phase masks in photo- thermo -refractive glass The views, opinions and/or findings...in photo- thermo -refractive glass Report Title In many applications such as beam shaping, mode conversion, and phase encoding it is necessary to alter...requiring a new means of producing phase masks. In this dissertation a method for producing robust phase masks in the bulk of photo- thermo - refractive

  3. Electron optical mask projector with a photocathode for miniaturization

    Science.gov (United States)

    Moellenstedt, G.; Speidel, R.; Dostmann, M.; Martin, F.; Mayr, M.

    1981-06-01

    The projector was developed with an image converter consisting of a masked photocathode and a plane anode grid. The mask structure to be demagnified is on a quartz glass plate in a thin layer of Ti02 strongly absorbing ultraviolet light. A photoemissive layer is deposited by evaporation on the whole front side of the plate. For the demagnification of the electron image of the mask, a system is used consisting of two geometrically similar magnetic lenses in a telescopic arrangement.

  4. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    OpenAIRE

    Yuri L. Motoyama; Gustavo B. Joel; Paulo E. A. Pereira; Gilmar J. Esteves; Azevedo, Paulo H.S.M.

    2016-01-01

    Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK) or a control group (CONT) and completed five sets of chest presses and parallel squats until failure at 75%...

  5. OSIRIS Multi-Object Spectroscopy: Mask Design Process

    Science.gov (United States)

    Gómez-Velarde, G.; García-Alvarez, D.; Cabrerra-Lavers, A.

    2016-10-01

    The OSIRIS (Optical System for Imaging and Low-Intermediate Resolution Integrated Spectroscopy) instrument at the 10.4 m GTC has offered a multi-object spectroscopic mode since March 2014. In this paper we describe the detailed process of designing a MOS mask for OSIRIS by using the Mask Designer Tool, and give some numbers on the accuracy of the mask manufacture achievable at the telescope for its scientific use.

  6. Quality enhancement of parallel MDP flows with mask suppliers

    Science.gov (United States)

    Deng, Erwin; Lee, Rachel; Lee, Chun Der

    2013-06-01

    For many maskshops, designed parallel mask data preparation (MDP) flows accompanying with a final data comparison are viewed as a reliable method that could reduce quality risks caused by mis-operation. However, in recent years, more and more mask data mistakes have shown that present parallel MDP flows could not capture all mask data errors yet. In this paper, we will show major failure models of parallel MDP flows from analyzing MDP quality accidents and share our approaches to achieve further improvement with mask suppliers together.

  7. Thermal management of masks for deep x-ray lithography.

    Energy Technology Data Exchange (ETDEWEB)

    Khounsary, A.; Chojnowski, D.; Mancini, D.C.; Lai, B.; Dejus, R.

    1997-11-18

    This paper addresses some options and techniques in the thermal management of masks used in deep x-ray lithography. The x-ray masks are thin plates made of low-atomic-number materials on which a patterned thin film of a high-atomic-number metal has been deposited. When they are exposed to an x-ray beam, part of the radiation is transmitted to replicate the pattern on a downstream photoresist, and the remainder is absorbed in the mask in the form of heat. This heat load can cause deformation of the mask and thus image distortion in the lithography process. The mask geometry considered in the present study is 100 mm x 100 mm in area, and about 0.1 to 2 mm thick. The incident radiation is a bending magnet x-ray beam having a footprint of 60 mm x 4 mm at the mask. The mask is scanned vertically about {+-} 30 mm so that a 60 mm x 60 mm area is exposed. the maximum absorbed heat load in the mask is 80 W, which is significantly greater than a few watts encountered in previous systems. In this paper, cooling techniques, substrate material selection, transient and steady state thermal and structural behavior, and other thermo-mechanical aspects of mask design are discussed. It is shown that, while diamond and graphite remain attractive candidates, at present beryllium is a more suitable material for this purpose and, when properly cooled, can provide the necessary dimensional tolerance.

  8. Practical mask inspection system with printability and pattern priority verification

    Science.gov (United States)

    Tsuchiya, Hideo; Ozaki, Fumio; Takahara, Kenichi; Inoue, Takafumi; Kikuiri, Nobutaka

    2011-05-01

    Through the four years of study in Association of Super-Advanced Electronics Technologies (ASET) on reducing mask manufacturing Turn Around Time (TAT) and cost, we have been able to establish a technology to improve the efficiency of the review process by applying a printability verification function that utilizes computational lithography simulations to analyze defects detected by a high-resolution mask inspection system. With the advent of Source-Mask Optimization (SMO) and other technologies that extend the life of existing optical lithography, it is becoming extremely difficult to judge a defect only by the shape of a mask pattern, while avoiding pseudo-defects. Thus, printability verification is indispensable for filtering out nuisance defects from high-resolution mask inspection results. When using computational lithography simulations to verify printability with high precision, the image captured by the inspection system must be prepared with extensive care. However, for practical applications, this preparation process needs to be simplified. In addition, utilizing Mask Data Rank (MDR) to vary the defect detection sensitivity according to the patterns is also useful for simultaneously inspecting minute patterns and avoiding pseudo-defects. Combining these two technologies, we believe practical mask inspection for next generation lithography is achievable. We have been improving the estimation accuracy of the printability verification function through discussion with several customers and evaluation of their masks. In this report, we will describe the progress of these practical mask verification functions developed through customers' evaluations.

  9. Estimation of the Ideal Binary Mask using Directional Systems

    DEFF Research Database (Denmark)

    Boldt, Jesper; Kjems, Ulrik; Pedersen, Michael Syskind

    2008-01-01

    and the requirements to enable calculations of the ideal binary mask using a directional system without the availability of the unmixed signals. The proposed method has a low complexity and is verified using computer simulation in both ideal and non-ideal setups showing promising results.......The ideal binary mask is often seen as a goal for time-frequency masking algorithms trying to increase speech intelligibility, but the required availability of the unmixed signals makes it difficult to calculate the ideal binary mask in any real-life applications. In this paper we derive the theory...

  10. Recent advances in CZT strip detectors and coded mask imagers

    Science.gov (United States)

    Matteson, J. L.; Gruber, D. E.; Heindl, W. A.; Pelling, M. R.; Peterson, L. E.; Rothschild, R. E.; Skelton, R. T.; Hink, P. L.; Slavis, K. R.; Binns, W. R.; Tumer, T.; Visser, G.

    1999-09-01

    The UCSD, WU, UCR and Nova collaboration has made significant progress on the necessary techniques for coded mask imaging of gamma-ray bursts: position sensitive CZT detectors with good energy resolution, ASIC readout, coded mask imaging, and background properties at balloon altitudes. Results on coded mask imaging techniques appropriate for wide field imaging and localization of gamma-ray bursts are presented, including a shadowgram and deconvolved image taken with a prototype detector/ASIC and MURA mask. This research was supported by NASA Grants NAG5-5111, NAG5-5114, and NGT5-50170.

  11. Recent patents and patented technology platforms for pharmaceutical taste masking.

    Science.gov (United States)

    Kaushik, Deepak; Dureja, Harish

    2014-04-01

    Taste masking is an important factor in the development of oral dosage forms containing bitter active pharmaceutical ingredients. Currently numerous techniques are being applied to overcome this problem. Realizing this, several researchers and pharmaceutical companies are now engaged in developing novel techniques to address the problem of taste masking evident by numerous patents filed in this area in recent times. In this review the most recent patents for taste masking are discussed and how these patents overcome the limitations of conventional approaches of taste masking is also highlighted. Novel techniques based on some recent patents such as nanohybrid, melt extrusion, non-complex cyclodextrin compositions and off taste masking are providing new realms to taste masking of bitter drugs. The present article also provides an overview of various patented platform technologies based on different techniques/mechanisms employed for taste masking. The unique features and principles of taste-masking approaches used in various patented technologies are also discussed. A better understanding of these new patents and patented technologies will help researchers and pharmaceutical industries to select the appropriate platform, or to develop innovative products with improved taste masking properties.

  12. Actinic inspection of multilayer defects on EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Barty, A; Liu, Y; Gullikson, E; Taylor, J S; Wood, O

    2005-03-24

    The production of defect-free mask blanks, and the development of techniques for inspecting and qualifying EUV mask blanks, remains a key challenge for EUV lithography. In order to ensure a reliable supply of defect-free mask blanks, it is necessary to develop techniques to reliably and accurately detect defects on un-patterned mask blanks. These inspection tools must be able to accurately detect all critical defects whilst simultaneously having the minimum possible false-positive detection rate. There continues to be improvement in high-speed non-actinic mask blank inspection tools, and it is anticipated that these tools can and will be used by industry to qualify EUV mask blanks. However, the outstanding question remains one of validating that non-actinic inspection techniques are capable of detecting all printable EUV defects. To qualify the performance of non-actinic inspection tools, a unique dual-mode EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron at Lawrence Berkeley National Laboratory. In high-speed inspection mode, whole mask blanks are scanned for defects using 13.5-nm wavelength light to identify and map all locations on the mask that scatter a significant amount of EUV light. In imaging, or defect review mode, a zone plate is placed in the reflected beam path to image a region of interest onto a CCD detector with an effective resolution on the mask of 100-nm or better. Combining the capabilities of the two inspection tools into one system provides the unique capability to determine the coordinates of native defects that can be used to compare actinic defect inspection with visible light defect inspection tools under commercial development, and to provide data for comparing scattering models for EUV mask defects.

  13. Multivariate refinement equation with nonnegative masks

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    This paper is concerned with multivariate refinement equations of the type ψ = ∑α∈Zs a(α)ψ(Mx - α),where ψ is the unknown function defined on the s-dimensional Euclidean space Rs, a is a finitely supported nonnegative sequence on Zs, and M is an s × s dilation matrix with m := |detM|. We characterize the existence of L2-solution of refinement equation in terms of spectral radius of a certain finite matrix or transition operator associated with refinement mask a and dilation matrix M. For s = 1 and M = 2, the sufficient and necessary conditions are obtained to characterize the existence of continuous solution of this refinement equation.

  14. Predicting masking release of lateralized speech

    DEFF Research Database (Denmark)

    Chabot-Leclerc, Alexandre; MacDonald, Ewen; Dau, Torsten

    2016-01-01

    al., 2013, J. Acoust. Soc. Am. 130], which uses a short-term equalization-cancellation process to model binaural unmasking. In the conditions where informational masking (IM) was involved, the predicted SRTs were lower than the measured values because the model is blind to confusions experienced......Locsei et al. (2015) [Speech in Noise Workshop, Copenhagen, 46] measured ˝ speech reception thresholds (SRTs) in anechoic conditions where the target speech and the maskers were lateralized using interaural time delays. The maskers were speech-shaped noise (SSN) and reversed babble with 2, 4, or 8...... talkers. For a given interferer type, the number of maskers presented on the target’s side was varied, such that none, some, or all maskers were presented on the same side as the target. In general, SRTs did not vary significantly when at least one masker was presented on the same side as the target...

  15. Coherent diffractive imaging using randomly coded masks

    Energy Technology Data Exchange (ETDEWEB)

    Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); D' Aspremont, Alexandre [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Turner, Joshua J. [Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

    2015-12-07

    We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments.

  16. Bunch Profiling Using a Rotating Mask

    Energy Technology Data Exchange (ETDEWEB)

    Miller, Mitchell; /SLAC /IIT, Chicago

    2012-08-24

    The current method for measuring profiles of proton bunches in accelerators is severely lacking. One must dedicate a great deal of time and expensive equipment to achieve meaningful results. A new method to complete this task uses a rotating mask with slots of three different orientations to collect this data. By scanning over the beam in three different directions, a complete profile for each bunch is built in just seconds, compared to the hours necessary for the previous method. This design was successfully tested using synchrotron radiation emitted by SPEAR3. The profile of the beam was measured in each of the three desired directions. Due to scheduled beam maintenance, only one set of data was completed and more are necessary to solve any remaining issues. The data collected was processed and all of the RMS sizes along the major and minor axes, as well as the tilt of the beam ellipse were measured.

  17. Masked emotional priming beyond global valence activations.

    Science.gov (United States)

    Rohr, Michaela; Degner, Juliane; Wentura, Dirk

    2012-01-01

    An immense body of research demonstrates that emotional facial expressions can be processed unconsciously. However, it has been assumed that such processing takes place solely on a global valence-based level, allowing individuals to disentangle positive from negative emotions but not the specific emotion. In three studies, we investigated the specificity of emotion processing under conditions of limited awareness using a modified variant of an affective priming task. Faces with happy, angry, sad, fearful, and neutral expressions were presented as masked primes for 33 ms (Study 1) or 14 ms (Studies 2 and 3) followed by emotional target faces (Studies 1 and 2) or emotional adjectives (Study 3). Participants' task was to categorise the target emotion. In all three studies, discrimination of targets was significantly affected by the emotional primes beyond a simple positive versus negative distinction. Results indicate that specific aspects of emotions might be automatically disentangled in addition to valence, even under conditions of subjective unawareness.

  18. GABAa agonist reduces visual awareness: a masking-EEG experiment

    NARCIS (Netherlands)

    van Loon, A.M.; Scholte, H.S.; van Gaal, S.; van der Hoort, B.J.J.; Lamme, V.A.F.

    2012-01-01

    Consciousness can be manipulated in many ways. Here, we seek to understand whether two such ways, visual masking and pharmacological intervention, share a common pathway in manipulating visual consciousness. We recorded EEG from human participants who performed a backward-masking task in which they

  19. Mechanisms of Masked Priming: Testing the Entry Opening Model

    Science.gov (United States)

    Wu, Hongmei

    2012-01-01

    Since it was introduced in Forster and Davis (1984), masked priming has been widely adopted in the psycholinguistic research on visual word recognition, but there has been little consensus on its actual mechanisms, i.e. how it occurs and how it should be interpreted. This dissertation addresses two different interpretations of masked priming, one…

  20. Prevalence and persistence of masked hypertension in treated hypertensive patients

    NARCIS (Netherlands)

    Verberk, Willem J.; Thien, Theo; Kroon, Abraham A.; Lenders, Jacques W. M.; van Montfrans, Gert A.; Smit, Andries J.; de Leeuw, Peter W.

    2007-01-01

    Background: Masked hypertension (MH) is defined as a normal blood pressure in the physician's office and an elevated blood pressure when measured out-of-office. The cause of MH may be termed the masked hypertension effect (MHE), and is not restricted to blood-pressure (BP) values around the threshol

  1. General Projective Synchronization and Fractional Order Chaotic Masking Scheme

    Institute of Scientific and Technical Information of China (English)

    Shi-Quan Shao

    2008-01-01

    In this paper, a fractional order chaotic masking scheme used for secure communication is introduced. Based on the general projective synchronization of two coupled fractional Chert systems, a popular masking scheme is designed. Numerical example is given to demonstrate the effectiveness of the proposed method.

  2. Optical vortex coronagraphy from soft spin-orbit masks

    CERN Document Server

    Aleksanyan, Artur

    2016-01-01

    We report on a soft route towards optical vortex coronagraphy based on self-engineered electrically tunable vortex masks based on liquid crystal topological defects. These results suggest that a Nature-assisted technological approach to the fabrication of complex phase masks could be useful in optical imaging whenever optical phase singularities are at play.

  3. 3D Rigorous simulation of mask induced polarization

    NARCIS (Netherlands)

    Wei, X.; Urbach, H.P.; Wachters, A.; Aksenov, Y.

    2005-01-01

    The polarization induced by the mask is studied by using a 3D rigorous model, wich solves Maxwell equations using the finite element method. Teh aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.

  4. Mask Design for the Space Interferometry Mission Internal Metrology

    Science.gov (United States)

    Marx, David; Zhao, Feng; Korechoff, Robert

    2005-01-01

    This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

  5. Silver-palladium braze alloy recovered from masking materials

    Science.gov (United States)

    Cierniak, R.; Colman, G.; De Carlo, F.

    1966-01-01

    Method for recovering powdered silver-palladium braze alloy from an acrylic spray binder and rubber masking adhesive used in spray brazing is devised. The process involves agitation and dissolution of masking materials and recovery of suspended precious metal particles on a filter.

  6. Mask Making: The Use of Expressive Arts with Leadership Development.

    Science.gov (United States)

    Jones, Angela Thomas

    The process of making one's own mask and having one's mask made was offered as an experiential exercise for a group of Outward Bound students training to be Outward Bound instructors. The integration of expressive arts with outdoor experiential education was an attempt to encourage balance between the technical and interpersonal skill development…

  7. Respiratory Protection Provided by Five New Contagion Masks

    Science.gov (United States)

    Guyton, H. Gerald; Decker, Herbert M.

    1963-01-01

    The effectiveness of five recently developed contagion masks in filtering air-borne particles (1 to 5 μ diam) has been reported. One mask, available in four sizes, was 99% efficient. This mask can be reused after sterilization. The other four masks are available in only one size and are intended to be used one time only. Two of these four disposable types were more than 90% efficient but the variability of their respective test results was much greater than that for the reusable mask. The two remaining disposable types were less than 80% efficient. Two of these contagion-mask types were worn by hospital personnel for periods of up to 8 hr to determine the effect of such prolonged use on aerosol filtration efficiency. No significant decrease in filtration efficiency was noted. Physicians, nurses, and other hospital personnel who wear masks will benefit from the increased individual respiratory protection afforded by improved contagion masks. Concurrently, the incidence of hospital patient air-borne infections should be greatly reduced. Images FIG. 1 PMID:13951516

  8. Masking interrupts figure-ground signals in V1

    NARCIS (Netherlands)

    Lamme, V.A.F.; Zipser, K.; Spekreijse, H.

    2002-01-01

    In a backward masking paradigm, a target stimulus is rapidly (<100 msec) followed by a second Stimulus. This typically results in a dramatic decrease in the visibility of the target stimulus. It has been shown that masking reduces responses in V1. It is not known, however, which process in V1 is aff

  9. Mechanisms of Masked Priming: Testing the Entry Opening Model

    Science.gov (United States)

    Wu, Hongmei

    2012-01-01

    Since it was introduced in Forster and Davis (1984), masked priming has been widely adopted in the psycholinguistic research on visual word recognition, but there has been little consensus on its actual mechanisms, i.e. how it occurs and how it should be interpreted. This dissertation addresses two different interpretations of masked priming, one…

  10. Migration from full-head mask to "open-face" mask for immobilization of patients with head and neck cancer.

    Science.gov (United States)

    Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-09-06

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to

  11. Antireflective surface patterned by rolling mask lithography

    Science.gov (United States)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  12. Task-Dependent Masked Priming Effects in Visual Word Recognition

    Science.gov (United States)

    Kinoshita, Sachiko; Norris, Dennis

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and non-words do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris and Kinoshita, 2008), and how the task dissociations can be used to understand the early processes in lexical access. PMID:22675316

  13. Task-dependent masked priming effects in visual word recognition.

    Science.gov (United States)

    Kinoshita, Sachiko; Norris, Dennis

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and non-words do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris and Kinoshita, 2008), and how the task dissociations can be used to understand the early processes in lexical access.

  14. Optical image encryption using Kronecker product and hybrid phase masks

    Science.gov (United States)

    Kumar, Ravi; Bhaduri, Basanta

    2017-10-01

    In this paper, we propose a new technique for security enhancement in optical image encryption system. In this technique we have used the Kronecker product of two random matrices along with the double random phase encoding (DRPE) scheme in the Fresnel domain for optical image encryption. The phase masks used here are different than the random masks used in conventional DRPE scheme. These hybrid phase masks are generated by using the combination of random phase masks and a secondary image. For encryption, the input image is first randomized and then the DRPE in the Fresnel domain is performed using the hybrid phase masks. Secondly, the Kronecker product of two random matrices is multiplied with the DRPE output to get the final encoded image for transmission. The proposed technique consists of more unknown keys for enhanced security and robust against various attacks. The simulation results along with effects under various attacks are presented in support of the proposed technique.

  15. Masked Hypertension: How to Identify and When to Treat?

    Science.gov (United States)

    Rizzoni, Damiano

    2016-09-01

    Approximately one out of 7-8 individuals with normal blood pressure (BP) in the clinic or doctor's office and one third of patients with chronic kidney disease with normal clinic BP have elevated ambulatory BP (masked hypertension). Patients with masked hypertension have an increased risk for target organ damage and a two-fold increased risk for cardiovascular events compared to patients with normal clinic and ambulatory BP. Despite this elevated risk for adverse outcomes, patients with masked hypertension have been excluded from hypertension trials because of their normal clinic BP. It is still unknown whether the reduction in target organ damage and adverse cardiovascular outcomes associated with treatment of hypertension extends to patients with masked hypertension. Ongoing and planned interventional studies will provide an answer to this crucial question in a few years. At present, it seems reasonable to follow the suggestion of current European guidelines, that lifestyle measures and drug treatment should be considered in the presence of masked hypertension.

  16. Study of critical dimension uniformity (CDU) using a mask inspector

    Science.gov (United States)

    Lin, Mei-Chun; Yu, Ching-Fang; Lai, Mei-Tsu; Hsu, Luke T. H.; Chin, Angus; Yen, Anthony

    2012-11-01

    This paper studies the repeatability and the reliability of CDUs from a mask inspector and their correlation with CD SEM measurements on various pattern attributes such as feature sizes, tones, and orientations. Full-mask image analysis with a mask inspector is one of potential solutions for overcoming the sampling rate limitation of a mask CD SEM. By comparing the design database with the inspected dimension, the complete CDU behavior of specific patterns can be obtained without extra work and tool time. These measurements can be mapped and averaged over various spatial lengths to determine changes in relative CDU across the mask. Eventually, success of this methodology relies on the optical system of the inspector being highly stable.

  17. [Clark's head tent or "small mask"? Value of high oxygen flows administered through a mask].

    Science.gov (United States)

    Landrieu, J P; Milhaud, A; Brille, P; Hermant, A; Tinturier, F

    1991-01-01

    The measurement of transcutaneous PtcO2 in eight normal adults prove a comparable efficacy of 50 l.min-1 O2 through facial "small mask" (61.5 kPa; 463 mmHg) and 20 l.min-1 O2 through head tent (65.1 kPa; 490 mmHg). First procedure, inexpensive, is very simple to use.

  18. The influence of masked hypertension on the right ventricle: is everything really masked?

    Science.gov (United States)

    Tadic, Marijana; Cuspidi, Cesare; Vukomanovic, Vladan; Celic, Vera; Pavlovic, Tatjana; Kocijancic, Vesna

    2016-04-01

    We sought to investigate right ventricular (RV) structure, function, and mechanics in subjects with masked hypertension (MH), normotensive, and sustained hypertensive patients. This cross-sectional study included 186 untreated subjects who underwent 24-hour ambulatory blood pressure (BP) monitoring and complete two-dimensional echocardiographic (2DE) examination including multilayer strain analysis. MH was diagnosed if clinic BP was normal (subjects with sustained hypertension. RV structure, function, and deformation are significantly changed in subjects with MH and sustained hypertension.

  19. A prototype erodible mask delivery system for the excimer laser.

    Science.gov (United States)

    Maloney, R K; Friedman, M; Harmon, T; Hayward, M; Hagen, K; Gailitis, R P; Waring, G O

    1993-04-01

    The authors developed an erodible mask delivery system for the argon-fluoride 193-nm excimer laser, which offers the possibility of correcting hyperopia and astigmatism as well as myopia. Masks were made of polymethylmethacrylate on a quartz window, with intended corrections for myopia and hyperopia of 2.5 and 5 diopters (D). Ablations using the mask and control ablations using an expanding diaphragm were performed in 30 eyes of 15 pigmented rabbits with an Excimed UV200 laser (Summit Technology, Inc, Waltham, MA). The rabbits were followed for 134 days with regular biomicroscopy and retinoscopic examination by two observers. Ablations with the mask to correct myopia were successful and produced stable corrections, although the higher-power mask produced undercorrections. Hyperopic masks produced paradoxic myopic corrections, possibly due to the lack of a transition zone at the edge of the mask. Corneas ablated with the mask had less sub-epithelial haze than those ablated with the diaphragm at all examinations. Results of histopathologic examination showed epithelial hyperplasia over the ablation zone in all eyes. Dichlorotriazinyl aminofluorescein collagen staining showed subepithelial new collagen in all eyes, but there was no relation between the depth of ablation at any point on the cornea and the amount of new collagen deposited there. Myopic ablations are feasible with the erodible mask, although additional calibration is needed. Hyperopic ablations were unsuccessful with the current design. Corneas ablated with the mask may be clearer than corneas ablated with the diaphragm, possibly due to a smoother ablated surface. Regression of effect after laser ablation in the rabbit model is likely due more to epithelial hyperplasia than to stromal remodeling.

  20. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  1. Objective measures of binaural masking level differences and comodulation masking release based on late auditory evoked potentials

    DEFF Research Database (Denmark)

    Epp, Bastian; Yasin, Ifat; Verhey, Jesko L.

    2013-01-01

    The audibility of important sounds is often hampered due to the presence of other masking sounds. The present study investigates if a correlate of the audibility of a tone masked by noise is found in late auditory evoked potentials measured from human listeners. The audibility of the target sound...

  2. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

    Science.gov (United States)

    Hector, Scott

    2005-11-01

    The extension of optical projection lithography through immersion to patterning features with half pitch cash flow models to predict the affordable R&D while maintaining industry accepted internal rates of return. The results have been compared to estimates of the total R&D cost to bring a new generation of mask equipment to market for various types of tools. The analysis revealed that affordability of the required R&D is a significant problem for many suppliers of mask-making equipment. Consortia such as SEMATECH and Selete have played an important role in cost sharing selected mask equipment and material development projects. Governments in the United States, in Europe and in Japan have also helped equipment suppliers with support for R&D. This paper summarizes the challenging business model for mask equipment suppliers and highlight government support for mask equipment and materials development.

  3. Challenges of the mask manufacturing approaching physical limits

    Science.gov (United States)

    Nesladek, Pavel

    2007-05-01

    Over the past 25 years, following the International Technology Roadmap for Semiconductors , 2006 [1], the main feature size of integrated circuits has decreased from approximately 3 μm to 70 nm. With feature sizes well below the exposure wavelength of the stepper, resolution enhancement features such as serifs, scatter-bars, and hammer heads are added to the mask design. Given a 4:1 reduction from mask to wafer, the resolution enhancement features, such as scatter bars, are roughly the same size as main features on the wafer. Recently, with the reduction of mask feature size, mask-manufacturing technology faces several problems in satisfying customer needs for resolution, CD uniformity, and CD linearity. The problems result, in part, as the legacy of material and process choices made in the early days of mask making. For example, the use of chrome as an absorber was suitable material choice for wet etch binary mask processes, but this material is now seen as problematic current dry etch process. Another general source of problems for the mask industry is its small size relative to wafer manufacturing. As a result, vendors focus material and equipment development efforts on wafer, and then make adaptations to fit mask-making requirements. Nowadays the patterns of high-end lithographic masks are written by variable shaped beam 50 kV e-beam writers with minimum beam size of as little as few nm. However, the latent pattern after writing differs significantly from the final pattern on the mask due to interactions during post exposure bake, resist development, and etch processes so the final pattern is a convolution of these effects. The parameters of interest are resolution, critical dimension uniformity (CDU), pattern fidelity, CD linearity, iso-dense as well as clear-dark bias, transmission of the transparent substrate and absorber, and birefringence. Besides these requirements, there are implicit, not specified, expectations that the mask has to fulfill. To this

  4. Supercrowding: weakly masking a target expands the range of crowding.

    Science.gov (United States)

    Vickery, Timothy J; Shim, Won Mok; Chakravarthi, Ramakrishna; Jiang, Yuhong V; Luedeman, Robert

    2009-02-10

    Crowding is impairment of peripheral object identification by nearby objects. Critical spacing (the minimum target-flanker distance that does not produce crowding) scales with target eccentricity and is consistently reported as roughly equal to or less than 50% of target eccentricity (0.5e). This study demonstrates that crowding occurs far beyond the typical critical spacing when the target is weakly masked by a surrounding contour or backwards pattern mask. A target was presented at a peripheral location on every trial and participants reported its orientation. Flankers appeared at target-flanker distances of 0.3-0.7e, or were absent. The target was presented with or without a mask. When flankers were absent, the masks only mildly impaired performance. When flankers were present but the mask was absent, target identification was nearly perfect at wide target-flanker distances (0.5e-0.7e). However, when flankers were present and the target was masked, performance dropped significantly, even when target-flanker distances far exceeded the typical crowding range. This phenomenon ("supercrowding") shares critical features with standard crowding: flankers similar to the target impair performance more than dissimilar flankers, and the characteristic anisotropic profile of crowding is preserved. Supercrowding may reflect a general interaction between crowding and other forms of masking.

  5. Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin Edward; Belikov, Ruslan; Guyon, Olivier; Balasubramanian, Kunjithapatham; Wilson, Dan

    2013-01-01

    Recent advances in coronagraph technologies for exoplanet imaging have achieved contrasts close to 1e10 at 4 lambda/D and 1e-9 at 2 lambda/D in monochromatic light. A remaining technological challenge is to achieve high contrast in broadband light; a challenge that is largely limited by chromaticity of the focal plane mask. The size of a star image scales linearly with wavelength. Focal plane masks are typically the same size at all wavelengths, and must be sized for the longest wavelength in the observational band to avoid starlight leakage. However, this oversized mask blocks useful discovery space from the shorter wavelengths. We present here the design, development, and testing of an achromatic focal plane mask based on the concept of optical filtering by a diffractive optical element (DOE). The mask consists of an array of DOE cells, the combination of which functions as a wavelength filter with any desired amplitude and phase transmission. The effective size of the mask scales nearly linearly with wavelength, and allows significant improvement in the inner working angle of the coronagraph at shorter wavelengths. The design is applicable to almost any coronagraph configuration, and enables operation in a wider band of wavelengths than would otherwise be possible. We include initial results from a laboratory demonstration of the mask with the Phase Induced Amplitude Apodization coronagraph.

  6. Application of DBM tool for detection of EUV mask defect

    Science.gov (United States)

    Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Yang, Hyunjo; Yim, Donggyu; Park, Byeongjun; Maruyama, Kotaro; Yamamoto, Masahiro

    2013-04-01

    Extreme ultraviolet lithography (EUVL) is one of the most leading lithography technologies for high volume manufacturing. The EUVL is based on reflective optic system therefore critical patterning issues are arisen from the surface of photomask. Defects below and inside of the multilayer or absorber of EUV photomask is one of the most critical issues to implement EUV lithography in mass production. It is very important to pick out and repair printable mask defects. Unfortunately, however, infrastructure for securing the defect free photomask such as inspection tool is still under development furthermore it does not seem to be ready soon. In order to overcome the lack of infrastructures for EUV mask inspection, we will discuss an alternative methodology which is based on wafer inspection results using DBM (Design Based Metrology) tool. It is very challenging for metrology to quantify real mask defect from wafer inspection result since various sources are possible contributor. One of them is random defect comes from poor CD uniformity. It is probable that those random defects are majority of a defect list including real mask defects. It is obvious that CD uniformity should be considered to pick out only a real mask defect. In this paper, the methodology to determine real mask defect from the wafer inspection results will be discussed. Experiments are carried out on contact layer and on metal layer using mask defect inspection tool, Teron(KLA6xx) and DBM (Design Based Metrology) tool, NGR2170™.

  7. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    Directory of Open Access Journals (Sweden)

    Yuri L. Motoyama

    2016-09-01

    Full Text Available Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK or a control group (CONT and completed five sets of chest presses and parallel squats until failure at 75% one-repetition-maximum test (1RM with 60 s of rest between sets. Ratings of perceived exertion (RPEs, blood lactate concentrations (Lac−, and total repetitions were taken after the training session. Results: MASK total repetitions were lower than those of the CONT, and (Lac− and MASK RPEs were higher than those of the CONT in both exercises. Conclusions: We conclude that an airflow-restricting mask in combination with resistance training increase perceptions of exertion and decrease muscular performance and lactate concentrations when compared to resistance training without this accessory. This evidence shows that the airflow-restricting mask may change the central nervous system and stop the exercise beforehand to prevent some biological damage.

  8. Masked areas in shear peak statistics. A forward modeling approach

    Energy Technology Data Exchange (ETDEWEB)

    Bard, D.; Kratochvil, J. M.; Dawson, W.

    2016-03-09

    The statistics of shear peaks have been shown to provide valuable cosmological information beyond the power spectrum, and will be an important constraint of models of cosmology in forthcoming astronomical surveys. Surveys include masked areas due to bright stars, bad pixels etc., which must be accounted for in producing constraints on cosmology from shear maps. We advocate a forward-modeling approach, where the impacts of masking and other survey artifacts are accounted for in the theoretical prediction of cosmological parameters, rather than correcting survey data to remove them. We use masks based on the Deep Lens Survey, and explore the impact of up to 37% of the survey area being masked on LSST and DES-scale surveys. By reconstructing maps of aperture mass the masking effect is smoothed out, resulting in up to 14% smaller statistical uncertainties compared to simply reducing the survey area by the masked area. We show that, even in the presence of large survey masks, the bias in cosmological parameter estimation produced in the forward-modeling process is ≈1%, dominated by bias caused by limited simulation volume. We also explore how this potential bias scales with survey area and evaluate how much small survey areas are impacted by the differences in cosmological structure in the data and simulated volumes, due to cosmic variance.

  9. Leak and obstruction with mask ventilation during simulated neonatal resuscitation.

    Science.gov (United States)

    Schilleman, Kim; Witlox, Ruben S; Lopriore, Enrico; Morley, Colin J; Walther, Frans J; te Pas, Arjan B

    2010-11-01

    To evaluate mask technique during simulated neonatal resuscitation and test the effectiveness of training in optimal mask handling. Seventy participants(consultants, registrars and nurses) from neonatal units were asked to administer positive pressure ventilation at a flow of 8 l/min and a frequency of 40-60/min to a modified leak free, term newborn manikin (lung compliance 0.5 ml/cm H(2)O) using a Neopuff T-piece device. Recordings were made (1) before training, (2) after training in mask handling and (3) 3 weeks later. Leak was calculated. Obstruction (tidal volume training, 10% (5-37%) directly after training and 15% (4-33%) 3 weeks later (ptraining and 3 weeks later in 46%, 42% and 37% of inflations, respectively. Severe obstruction did not occur. Mask ventilation during simulated neonatal resuscitation was often hampered by large leaks at the face mask. Moderate airway obstruction occurred frequently when effort was taken to minimise leak. Training in mask ventilation reduced mask leak but should also focus on preventing airway obstruction.

  10. GUSTATORY SYSTEM AND MASKING THE TASTE OF BITTER HERBS

    Directory of Open Access Journals (Sweden)

    Vinita Kale, Chetan Tapre and Abhay Ittadwar

    2013-11-01

    Full Text Available The oral route is the most easy and favorable route of drug administration. The development of oral formulations containing bitter herbs has widely been required in pharmaceutical and herbal industry. The human gustatory system is capable of identifying five major taste qualities: sweet, sour, salty, bitter and umami (savory. Different receptors and transduction mechanisms are involved in the detection of each taste quality. Many efforts have been focused to improve the palatability in these products that has prompted in the development of numerous techniques of taste masking. Once a method for taste masking is adopted, it becomes apparent to evaluate the effectiveness of the taste masked product. The major hurdle in evaluation of measuring the effectiveness of taste masking is that the taste is a highly subjective property and it varies demographically and with the age and gender. This communication gives a brief account of gustatory system, the receptor and transduction mechanism of bitter taste and various techniques used in taste masking of the bitters. The review also reveals the in-vitro and in-vivo methods for evaluating taste masked efficiency of developed product. Finally, the review concludes that proper choice of method for taste masking method is essential and it might depend on the properties of the herbs.

  11. Do Plant-Bound Masked Mycotoxins Contribute to Toxicity?

    Directory of Open Access Journals (Sweden)

    Silvia W. Gratz

    2017-02-01

    Full Text Available Masked mycotoxins are plant metabolites of mycotoxins which co-contaminate common cereal crops. Since their discovery, the question has arisen if they contribute to toxicity either directly or indirectly through the release of the parent mycotoxins. Research in this field is rapidly emerging and the aim of this review is to summarize the latest knowledge on the fate of masked mycotoxins upon ingestion. Fusarium mycotoxins are the most prevalent masked mycotoxins and evidence is mounting that DON3Glc and possibly other masked trichothecenes are stable in conditions prevailing in the upper gut and are not absorbed intact. DON3Glc is also not toxic per se, but is hydrolyzed by colonic microbes and further metabolized to DOM-1 in some individuals. Masked zearalenone is rather more bio-reactive with some evidence on gastric and small intestinal hydrolysis as well as hydrolysis by intestinal epithelium and components of blood. Microbial hydrolysis of ZEN14Glc is almost instantaneous and further metabolism also occurs. Identification of zearalenone metabolites and their fate in the colon are still missing as is further clarification on whether or not masked zearalenone is hydrolyzed by mammalian cells. New masked mycotoxins continuously emerge and it is crucial that we gain detailed understanding of their individual metabolic fate in the body before we can assess synergistic effects and extrapolate the additive risk of all mycotoxins present in food.

  12. New method of contour-based mask-shape compiler

    Science.gov (United States)

    Matsuoka, Ryoichi; Sugiyama, Akiyuki; Onizawa, Akira; Sato, Hidetoshi; Toyoda, Yasutaka

    2007-10-01

    We have developed a new method of accurately profiling a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, it is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method for a DFM solution in which two dimensional data are extracted for an error free practical simulation by precise reproduction of a real mask shape in addition to the mask data simulation. The flow centering around the design data is fully automated and provides an environment where optimization and verification for fully automated model calibration with much less error is available. It also allows complete consolidation of input and output functions with an EDA system by constructing a design data oriented system structure. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

  13. Simulation of AIMS measurements using rigorous mask 3D modeling

    Science.gov (United States)

    Chou, Chih-Shiang; Huang, Hsu-Ting; Chu, Fu-Sheng; Chu, Yuan-Chih; Huang, Wen-Chun; Liu, Ru-Gun; Gau, Tsai-Sheng

    2015-03-01

    Aerial image measurement system (AIMSTM) has been widely used for wafer level inspection of mask defects. Reported inspection flows include die-to-die (D2D) and die-to-database (D2DB) methods. For patterns that do not repeat in another die, only the D2DB approach is applicable. The D2DB method requires accurate simulation of AIMS measurements for a mask pattern. An optical vectorial model is needed to depict the mask diffraction effect in this simulation. To accurately simulate the imaging results, a rigorous electro-magnetic field (EMF) model is essential to correctly take account of the EMF scattering induced by the mask topography, which is usually called the mask 3D effect. In this study, the mask 3D model we use is rigorous coupled-wave analysis (RCWA), which calculates the diffraction fields from a single plane wave incidence. A hybrid Hopkins-Abbe method with RCWA is used to calculate the EMF diffraction at a desired accuracy level while keeping the computation time practical. We will compare the speed of the hybrid Hopkins-Abbe method to the rigorous Abbe method. The matching between simulation and experiment is more challenging for AIMS than CD-SEM because its measurements provide full intensity information. Parameters in the mask 3D model such as film stack thickness or film optical properties, is optimized during the fitting process. We will report the fitting results of AIMS images for twodimensional structures with various pitches. By accurately simulating the AIMS measurements, it provides a necessary tool to perform the mask inspection using the D2DB approach and to accurately predict the mask defects.

  14. Potential of mask production process for finer pattern fabrication

    Science.gov (United States)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2013-09-01

    Photomask used for optical lithography has been developed for purpose of fabrication a pattern along with finer designed rules and increase the productivity. With regard to pattern fabrication on mask, EB (Electron beam) mask writer has been used because it has high resolution beam. But in producing photomask, minimum pattern size on mask is hits a peak around 40nm by the resolution limit of ArF immersion systems. This value is easy to achieve by current EB writer. So, photomask process with EB writer has gotten attached to increase turnaround time. In next generation lithography such as EUV (Extreme ultraviolet) lithography and Nano-imprint lithography, it is enable to fabricate finer pattern beyond the resolution limit of ArF immersion systems. Thereby the pattern on a mask becomes finer rapidly. According to ITRS 2012, fabrication of finer patterns less than 20nm will be required on EUV mask and on NIL template. Especially in NIL template, less than 15nm pattern will be required half a decade later. But today's development of EB writer is aiming to increase photomask's productivity, so we will face a difficulty to fabricate finer pattern in near future. In this paper, we examined a potential of mask production process with EB writer from the view of finer pattern fabrication performances. We succeeded to fabricate hp (half-pitch) 17nm pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer with CAR (Chemically Amplified Resist). This result suggests that the photomask fabrication process has the potential for sub-20nm generation mask production.

  15. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  16. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin D.; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    It has been suggested that the level dependence of the upper masking slopebe utilised in perceptual models in bit-rate reduction systems. However,comodulation masking release (CMR) phenomena lead to a reduction of themasking effect when a masker and a probe signal are amplitude modulated withthe...... same frequency. In bit-rate reduction systems the masker would be theaudio signal and the probe signal would represent the quantization noise.Masking curves have been determined for sinusoids and 1-Bark-wide noisemaskers in order to investigate the risk of CMR, when quantizing depths arefixed...

  17. Rheumatic masks of plasma cell dyscrasias

    Directory of Open Access Journals (Sweden)

    Vladimir Ivanovich Vasilyev

    2012-01-01

    Full Text Available Objective: to consider clinical practice problems in the differential diagnosis of different types of plasma cell dyscrasias (PCD. Subjects and methods. Fourteen patients (8 men and 6 women aged 52±12 years, in whom rheumatic diseases (RD were ruled out and who were diagnosed as having primary PCD: different types of myeloma in 7 patients, myeloma + AL-amyloidosis in 2, AL-amyloidosis in 3, and Waldenstrom’s macroglobulinemia in 2, were examined. Results and discussion. The most common maldiagnosed RDs in patients with PCD were seronegative rheumatoid arthritis (RA, systemic lupus erythematosus, Sjogren’s disease, and different forms of vasculitis. The most frequent masks of RD were kidney (78% and osteoarticular system (64% lesions, vascular disorders (36%, peripheral polyneuropathies (36%, and enlarged salivary glands with xerostomia (28.5%. Serum and urine immunochemical study should be performed in all patients who have clinical manifestations of seropositive RA, spondyloarthritis, intensive bone pain syndrome, ulceronecrotic vasculitis, enlarged submandibular salivary glands with macroglossia in the absence of markers of autoimmune disease for the timely diagnosis of PCD and the exclusion of RD. The paper estimates the sensitivity and specificity of main methods used to diagnose different types of PCD.

  18. Surround-Masking Affects Visual Estimation Ability

    Science.gov (United States)

    Jastrzebski, Nicola R.; Hugrass, Laila E.; Crewther, Sheila G.; Crewther, David P.

    2017-01-01

    Visual estimation of numerosity involves the discrimination of magnitude between two distributions or perceptual sets that vary in number of elements. How performance on such estimation depends on peripheral sensory stimulation is unclear, even in typically developing adults. Here, we varied the central and surround contrast of stimuli that comprised a visual estimation task in order to determine whether mechanisms involved with the removal of unessential visual input functionally contributes toward number acuity. The visual estimation judgments of typically developed adults were significantly impaired for high but not low contrast surround stimulus conditions. The center and surround contrasts of the stimuli also differentially affected the accuracy of numerosity estimation depending on whether fewer or more dots were presented. Remarkably, observers demonstrated the highest mean percentage accuracy across stimulus conditions in the discrimination of more elements when the surround contrast was low and the background luminance of the central region containing the elements was dark (black center). Conversely, accuracy was severely impaired during the discrimination of fewer elements when the surround contrast was high and the background luminance of the central region was mid level (gray center). These findings suggest that estimation ability is functionally related to the quality of low-order filtration of unessential visual information. These surround masking results may help understanding of the poor visual estimation ability commonly observed in developmental dyscalculia.

  19. A closer look at four-dot masking of a foveated target

    Directory of Open Access Journals (Sweden)

    Marwan Daar

    2016-06-01

    Full Text Available Four-dot masking with a common onset mask was recently demonstrated in a fully attended and foveated target (Filmer, Mattingley & Dux, 2015. Here, we replicate and extend this finding by directly comparing a four-dot mask with an annulus mask while probing masking as a function of mask duration, and target-mask separation. Our results suggest that while an annulus mask operates via spatially local contour interactions, a four-dot mask operates through spatially global mechanisms. We also measure how the visual system’s representation of an oriented bar is impacted by a four-dot mask, and find that masking here does not degrade the precision of perceived targets, but instead appears to be driven exclusively by rendering the target completely invisible.

  20. Comparison of Ventilation With One-Handed Mask Seal With an Intraoral Mask Versus Conventional Cuffed Face Mask in a Cadaver Model: A Randomized Crossover Trial.

    Science.gov (United States)

    Amack, Andrew J; Barber, Gary A; Ng, Patrick C; Smith, Thomas B; April, Michael D

    2017-01-01

    We compare received minute volume with an intraoral mask versus conventional cuffed face mask among medics obtaining a 1-handed mask seal on a cadaver model. This study comprised a randomized crossover trial of adult US Army combat medic volunteers participating in a cadaver laboratory as part of their training. We randomized participants to obtain a 1-handed mask seal during ventilation of a fresh unembalmed cadaver, first using either an intraoral airway device or conventional cuffed face mask. Participants obtained a 1-handed mask seal while a ventilator delivered 10 standardized 750-mL breaths during 1 minute. After a 5-minute rest period, they repeated the study with the alternative mask. The primary outcome measure was received minute volume as measured by a respirometer. Of 27 recruited participants, all completed the study. Median received minute volume was higher with the intraoral mask compared with conventional cuffed mask by 1.7 L (95% confidence interval 1.0 to 1.9 L; P<.001). The intraoral mask resulted in greater received minute volume received compared with conventional cuffed face mask during ventilation with a 1-handed mask seal in a cadaver model. The intraoral mask may prove a useful airway adjunct for ventilation. Copyright © 2016 American College of Emergency Physicians. Published by Elsevier Inc. All rights reserved.

  1. Comparison of Supreme Laryngeal Mask Airway and ProSeal Laryngeal Mask Airway during Cholecystectomy

    OpenAIRE

    2012-01-01

    Objective: This study compared the safety and efficacy of the Supreme Laryngeal Mask Airway (S-LMA) with that of the ProSeal-LMA (P-LMA) in laparoscopic cholecystectomy. Material and Methods: Sixty adults were randomly allocated. Following anaesthesia induction, experienced LMA users inserted the airway devices. Results: Oropharyngeal leak pressure was similar in groups (S-LMA, 27.8±2.9 cmH20; P-LMA, 27.0±4.7 cmH20; p=0.42) and did not change...

  2. Comparison of Supreme Laryngeal Mask Airway and ProSeal Laryngeal Mask Airway during Cholecystectomy

    OpenAIRE

    2012-01-01

    Objective: This study compared the safety and efficacy of the Supreme Laryngeal Mask Airway (S-LMA) with that of the ProSeal-LMA (P-LMA) in laparoscopic cholecystectomy.Material and Methods: Sixty adults were randomly allocated. Following anaesthesia induction, experienced LMA users inserted the airway devices. Results: Oropharyngeal leak pressure was similar in groups (S-LMA, 27.8±2.9 cmH20; P-LMA, 27.0±4.7 cmH20; p=0.42) and did not change during the induction of and throughout pneumoperit...

  3. Phase retrieval from multiple binary masks generated speckle patterns

    Science.gov (United States)

    Gong, Hai; Pozzi, Paolo; Soloviev, Oleg; Verhaegen, Michel; Vdovin, Gleb

    2016-04-01

    We present a reference-less and time-multiplexing phase retrieval method by making use of the digital micromirror device (DMD). In this method, the DMD functions not only as a flexible binary mask which modulates the optical field, but also as a sampling mask for measuring corresponding phases, which makes the whole setup simple and robust. The DMD reflection forms a sparse intensity mask in the pupil which produces speckle pattern after propagation. With the recorded intensity on the camera and the binary pattern on the DMD, the phase in all the `on' pixels can be reconstructed at once by solving inverse problems with iterative methods, for instance using Gerchberg-Saxton algorithm. Then the phase of the whole pupil can be reconstructed from a series of binary patterns and speckle patterns. Numerical experiments show the feasibility of this phase retrieval method and the importance of sparse binary masks in the improving of convergence speed.

  4. MISR radiometric camera-by-camera Cloud Mask V004

    Data.gov (United States)

    National Aeronautics and Space Administration — This file contains the Radiometric camera-by-camera Cloud Mask dataset. It is used to determine whether a scene is classified as clear or cloudy. A new parameter has...

  5. A Binary Shaped Mask Coronagraph for a Segmented Pupil

    CERN Document Server

    Enya, K

    2011-01-01

    We present the concept of a binary shaped mask coronagraph applicable to a telescope pupil including obscuration, based on previous works on binary shaped pupil mask by \\citet{Kasdin2005} and \\citet{Vanderbei1999}. Solutions with multi-barcode masks which "skip over" the obscuration are shown for various types of pupil of telescope, such as SUBARU, JWST, SPICA, and other examples. The number of diffraction tails in the point spread function of the coronagraphic image is reduced to two, thus offering a large discovery angle. The concept of mask rotation is also presented, which allows post-processing removal of diffraction tails and provides a 360$^{\\circ}$ continuous discovery angle. It is suggested that the presented concept offers solutions which potentially allow large telescopes with segmented pupil in future to be used as platforms for an coronagraph.

  6. A Precise-Mask-Based Method for Enhanced Image Inpainting

    Directory of Open Access Journals (Sweden)

    Wanxu Zhang

    2016-01-01

    Full Text Available Mask of damage region is the pretreatment step of the image inpainting, which plays a key role in the ultimate effect. However, state-of-the-art methods have attached significance to the inpainting model, and the mask of damage region is usually selected manually or by the conventional threshold-based method. Since manual method is time-consuming and the threshold-based method does not have the same precision for different images, we herein report a new method for automatically constructing the precise mask by the joint filtering of guided filtering and L0 smoothing. It can accurately locate the boundary of damaged region in order to effectively segment the damage region and then greatly improves the ultimate effect of image inpainting. The experimental results show that the proposed method is superior to state-of-the-art methods in the step of constructing inpainting mask, especially for the damaged region with inconspicuous boundary.

  7. Reproductive biology of the masked triggerfish Sufflamen fraenatus

    Digital Repository Service at National Institute of Oceanography (India)

    Sahayak, S.

    The reproductive biology of the masked triggerfish Sufflamen fraenatus was studied. Three distinct stages, viz. immature, maturing and mature were identified based on the external appearance of the ovary and the ova diameter studies. The fish...

  8. Kuldne Mask Tallinnasssssss! / Sergei Zhenovatsh ; interv. Hellar Bergmann

    Index Scriptorium Estoniae

    Zhenovatsh, Sergei

    2008-01-01

    Lavastaja Sergei Zhenovatsh oma Teatrikunsti Stuudiost, noortest näitlejatest, Eestist. Lavastaja on Eestis teatrifestivali "Kuldne mask Eestis" raames. 10.-11. okt. etendus Tallinnas, Salme Kultuurikeskuses Nikolai Gogoli näidend "Mängurid"

  9. Open-loop frequency response for a chaotic masking system

    Institute of Scientific and Technical Information of China (English)

    Huang Xian-Gao; Yu Pei; Huang Wei

    2006-01-01

    In this paper, a new numerical simulation approach is proposed for the study of open-loop frequency response of a chaotic masking system. Using Chua's circuit and the Lorenz system as illustrative examples, we have shown that one can employ chaos synchronization to separate the feedback network from a chaotic masking system, and then use numerical simulation to obtain the open-loop synchronization response, the phase response, and the amplitude response of a chaotic masking system. Based on the analysis of the frequency response, we have also proved that changing the amplitude of the exciting (input) signal within normal working domain does not influence the frequency response of the chaotic masking system. The new numerical simulation method developed in this paper can be extended to consider the open-loop frequency response of other systems described by differential or difference equations.

  10. Mask roughness induced LER: a rule of thumb -- paper

    Energy Technology Data Exchange (ETDEWEB)

    McClinton, Brittany; Naulleau, Patrick

    2010-03-12

    Much work has already been done on how both the resist and line-edge roughness (LER) on the mask affect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and currently factor into LER limits. Here, we propose a 'rule-of-thumb' simplified solution that provides a fast and powerful method to obtain mask roughness induced LER. We present modeling data on an older generation mask with a roughness of 230 pm as well as the ultimate target roughness of 50 pm. Moreover, we consider feature sizes of 50 nm and 22 nm, and show that as a function of correlation length, the LER peaks at the condition that the correlation length is approximately equal to the resolution of the imaging optic.

  11. Backward Masked Snakes and Guns Modulate Spatial Attention

    Directory of Open Access Journals (Sweden)

    Joshua M. Carlson

    2009-10-01

    Full Text Available Fearful faces are important social cues that alert others of potential threat. Even backward masked fearful faces facilitate spatial attention. However, visual stimuli other than fearful faces can signal potential threat. Indeed, unmasked snakes and spiders modulate spatial attention. Yet, it is unclear if the rapid threat-related facilitation of spatial attention to backward masked stimuli is elicited by non-face threat cues. Evolutionary theories claim that phylogenetic threats (i.e. snakes and spiders should preferentially elicit an automatic fear response, but it is untested as to whether this response extends to enhancements in spatial attention under restricted processing conditions. Thirty individuals completed a backward masking dot-probe task with both evolutionary relevant and irrelevant threat cues. The results suggest that backward masked visual fear stimuli modulate spatial attention. Both evolutionary relevant (snake and irrelevant (gun threat cues facilitated spatial attention.

  12. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin David; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    It has been suggested that the level dependence of the upper masking slope be utilized in perceptual models in bit-rate reduction systems. However, comodulation masking release (CMR) phenomena lead to a reduction of the masking effect when a masker and a probe signal are amplitude modulated...... with the same frequency. In bit-rate reduction systems the masker would be the audio signal and the probe signal would represent the quantization noise. Masking curves have been determined for sinusoids and 1-Bark-wide noise maskers in order to investigate the risk of CMR, when quantizing depths are fixed.......75. A CMR of up to 10 dB was obtained at a distance of 6 Bark above the masker. The amount of CMR was found to depend on the presentation level of the masker; a higher masker level leads to a higher CMR effect. Hence, the risk of CMR affecting the subjective performance of bit-rate reduction systems cannot...

  13. Comparison of three methods in improving bag mask ventilation

    Directory of Open Access Journals (Sweden)

    Samad EJ Golzari

    2014-01-01

    Conclusions: Leaving dentures in place in edentulous patients after inducing anesthesia improves bag-mask ventilation. However, placing folded compressed gauze in buccal space leads to more significant improvement in BMV compared to leaving dentures in place.

  14. Normal Blood Pressure in Clinic May Mask Hypertension

    Science.gov (United States)

    ... https://medlineplus.gov/news/fullstory_162363.html Normal Blood Pressure in Clinic May Mask Hypertension Young, lean patients can have high blood pressure that's not caught during regular exams, study finds ...

  15. Lithographic performance of a new "low-k" mask

    Science.gov (United States)

    Adachi, Takashi; Tani, Ayako; Fujimura, Yukihiro; Hayano, Katsuya; Morikawa, Yasutaka; Miyashita, Hiroyuki; Inazuki, Yukio; Kawai, Yoshio

    2016-05-01

    We have been researching new mask blank materials for the next generation lithography (NGL) and developed a new mask blank with low-k phase shifter [1] [2]. The low-k phase shifter consists of only Si and N. In our previous work, we reported the advantages of developed SiN phase shift mask (PSM) [2]. It showed high lithographic performance and high durability against ArF excimer laser as well as against cleaning. In this report, we further verified its high lithographic performance on several types of device pattern. The SiN PSM had high lithographic performance compared with conventional 6% MoSi PSM. Exposure latitude (EL) and mask enhancement factor (MEEF) were especially improved on originally designed Gate, Metal and Via patterns.

  16. Coronagraph-Integrated Wavefront Sensing with a Sparse Aperture Mask

    CERN Document Server

    Subedi, Hari; Kasdin, N Jeremy; Cavanagh, Kathleen; Riggs, A J Eldorado

    2015-01-01

    Stellar coronagraph performance is highly sensitive to optical aberrations. In order to effectively suppress starlight for exoplanet imaging applications, low-order wavefront aberrations entering a coronagraph such as tip-tilt, defocus and coma must be determined and compensated. Previous authors have established the utility of pupil-plane masks (both non-redundant/sparse-aperture and generally asymmetric aperture masks) for wavefront sensing. Here we show how a sparse aperture mask (SAM) can be integrated with a coronagraph to measure low-order, differential phase aberrations. Starlight rejected by the coronagraph's focal plane stop is collimated to a relay pupil, where the mask forms an interference fringe pattern on a subsequent detector. Our numerical Fourier propagation models show that the information encoded in the fringe intensity distortions is sufficient to accurately discriminate and estimate Zernike phase modes extending from tip-tilt up to radial degree $n=5$, with amplitude up to $\\lambda/20$ RM...

  17. Kuldne Mask Tallinnasssssss! / Sergei Zhenovatsh ; interv. Hellar Bergmann

    Index Scriptorium Estoniae

    Zhenovatsh, Sergei

    2008-01-01

    Lavastaja Sergei Zhenovatsh oma Teatrikunsti Stuudiost, noortest näitlejatest, Eestist. Lavastaja on Eestis teatrifestivali "Kuldne mask Eestis" raames. 10.-11. okt. etendus Tallinnas, Salme Kultuurikeskuses Nikolai Gogoli näidend "Mängurid"

  18. The effect of masking in the attentional dwell time paradigm

    DEFF Research Database (Denmark)

    Petersen, Anders

    2009-01-01

    A temporary functional blindness to the second of two spatially separated targets has been identified in numerous studies of temporal visual attention. This effect is known as attentional dwell time and is maximal 200 to 500 ms after presentation of the first target (e.g. Duncan, Ward, Shapiro......, 1994). In most studies of attentional dwell time, two masked targets have been used. Moore et al. (1996) have criticised the masking of the first target when measuring the attentional dwell time, finding a shorter attentional dwell time when the first mask was omitted. In the presented work, the effect...... an impairment of the second target. Hence, the attentional dwell time may be a combined effect arising from attending to both the first target and its mask....

  19. Improve mask inspection capacity with Automatic Defect Classification (ADC)

    Science.gov (United States)

    Wang, Crystal; Ho, Steven; Guo, Eric; Wang, Kechang; Lakkapragada, Suresh; Yu, Jiao; Hu, Peter; Tolani, Vikram; Pang, Linyong

    2013-09-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The adoption of RET techniques like aggressive OPC, sub-resolution assist features combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for mask inspection operators and engineers. Therefore a comprehensive approach is required in handling defects post-inspections by correctly identifying and classifying the real killer defects impacting the printability on wafer, and ignoring nuisance defect and false defects caused by inspection systems. This paper focuses on the results from the evaluation of Automatic Defect Classification (ADC) product at the SMIC mask shop for the 40nm technology node. Traditionally, each defect is manually examined and classified by the inspection operator based on a set of predefined rules and human judgment. At SMIC mask shop due to the significant total number of detected defects, manual classification is not cost-effective due to increased inspection cycle time, resulting in constrained mask inspection capacity, since the review has to be performed while the mask stays on the inspection system. Luminescent Technologies Automated Defect Classification (ADC) product offers a complete and systematic approach for defect disposition and classification offline, resulting in improved utilization of the current mask inspection capability. Based on results from implementation of ADC in SMIC mask production flow, there was around 20% improvement in the inspection capacity compared to the traditional flow. This approach of computationally reviewing defects post mask-inspection ensures no yield loss by qualifying reticles without the errors associated with operator mis-classification or human error. The ADC engine retrieves the high resolution inspection images and uses a decision-tree flow to classify a given defect. Some identification mechanisms adopted by ADC to

  20. Natural gas; Gas Natural

    Energy Technology Data Exchange (ETDEWEB)

    Lopes, Carlos A.; Moraes, Claudia C.D. [Eletricidade de Sao Paulo S.A. (ELETROPAULO), Sao Paulo, SP (Brazil); Fonseca, Carlos H.F. [Centrais Eletricas de Santa Catarina S.A., Florianopolis, SC (Brazil); Silva, Clecio Fabricio da; Alves, Ricardo P. [Companhia Paranaense de Energia (COPEL), Curitiba, PR (Brazil); Sposito, Edivaldo Soares; Hulle, Lutero [Espirito Santo Centrais Eletricas S.A. (ESCELSA), Vitoria, ES (Brazil); S. Martins, Icaro da [Centrais Eletricas do Norte do Brasil S.A. (ELETRONORTE), Belem, PA (Brazil); Vilhena, Joao Luiz S. de [Companhia Energetica de Minas Gerais (CEMIG), Belo Horizonte, MG (Brazil); Fagundes, Zaluar Aquino [Companhia Estadual de Energia Eletrica do Estado do Rio Grande do Sul, Porto Alegre, RS (Brazil)

    1996-12-31

    An increase in the consumption of natural gas in Brazil is an expected fact in what concerns energetic planning. This work presents the existing situation in what concerns natural gas utilization in the main world economies, as well as an analysis of the participation of this fuel among the energy final consumption per sources. The Brazilian consumption of natural gas is also analysed as well as the international agreement between Brazil and Bolivia for natural gas commercialization. Some legal, institutional and political aspects related to natural gas commercialization are also discussed. Finally, several benefits to be brought by the utilization of natural gas are presented 10 refs., 3 tabs.

  1. Bubble masks for time-encoded imaging of fast neutrons.

    Energy Technology Data Exchange (ETDEWEB)

    Brubaker, Erik; Brennan, James S.; Marleau, Peter; Nowack, Aaron B.; Steele, John T.; Sweany, Melinda; Throckmorton, Daniel J.

    2013-09-01

    Time-encoded imaging is an approach to directional radiation detection that is being developed at SNL with a focus on fast neutron directional detection. In this technique, a time modulation of a detected neutron signal is inducedtypically, a moving mask that attenuates neutrons with a time structure that depends on the source position. An important challenge in time-encoded imaging is to develop high-resolution two-dimensional imaging capabilities; building a mechanically moving high-resolution mask presents challenges both theoretical and technical. We have investigated an alternative to mechanical masks that replaces the solid mask with a liquid such as mineral oil. Instead of fixed blocks of solid material that move in pre-defined patterns, the oil is contained in tubing structures, and carefully introduced air gapsbubblespropagate through the tubing, generating moving patterns of oil mask elements and air apertures. Compared to current moving-mask techniques, the bubble mask is simple, since mechanical motion is replaced by gravity-driven bubble propagation; it is flexible, since arbitrary bubble patterns can be generated by a software-controlled valve actuator; and it is potentially high performance, since the tubing and bubble size can be tuned for high-resolution imaging requirements. We have built and tested various single-tube mask elements, and will present results on bubble introduction and propagation as a function of tubing size and cross-sectional shape; real-time bubble position tracking; neutron source imaging tests; and reconstruction techniques demonstrated on simple test data as well as a simulated full detector system.

  2. [Prospective therapeutic trial of masking treatment in patients with tinnitus].

    Science.gov (United States)

    Hernández Moñiz, F; Barrio, A; Pérez, A; Pertierra, M A; Salafranca, J M; González, M

    1998-01-01

    We report the results of a therapeutic trial of patients with tinnitus of different characteristics that was unresponsive to other medical or surgical treatments. Treatment was based on a combination of biofeedback training designed to reduce stress and either pure masking therapy or masking therapy consisting of a hearing aid and masker. The results showed an improvement in subjective perceptions and in the audiometric parameter of pitch in a significant percentage of patients.

  3. Phase shifting mask modulated laser patterning on graphene

    Science.gov (United States)

    Gao, Fan; Liu, Fengyuan; Ye, Ziran; Sui, Chenghua; Yan, Bo; Cai, Pinggen; Lv, Bin; Li, Yun; Chen, Naibo; Zheng, Youdou; Shi, Yi

    2017-01-01

    A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.

  4. Causal binary mask estimation for speech enhancement using sparsity constraints

    DEFF Research Database (Denmark)

    Kressner, Abigail Anne; Anderson, David V.; Rozell, Christopher J.

    2013-01-01

    While most single-channel noise reduction algorithms fail to improve speech intelligibility, the ideal binary mask (IBM) has demonstrated substantial intelligibility improvements for both normal- and impaired-hearing listeners. However, this approach exploits oracle knowledge of the target and in...... algorithm from the signal processing literature. However, the algorithm employs a non-causal estimator. The present work introduces an improved de-noising algorithm that uses more realistic frame-based (causal) computations to estimate a binary mask....

  5. An Experimental Investigation of Secure Communication With Chaos Masking

    CERN Document Server

    Dhar, Sourav

    2007-01-01

    The most exciting recent development in nonlinear dynamics is realization that chaos can be useful. One application involves "Secure Communication". Two piecewise linear systems with switching nonlinearities have been taken as chaos generators. In the present work the phenomenon of secure communication with chaos masking has been investigated experimentally. In this investigation chaos which is generated from two chaos generators is masked with the massage signal to be transmitted, thus makes communication is more secure.

  6. Oncologic image compression using both wavelet and masking techniques.

    Science.gov (United States)

    Yin, F F; Gao, Q

    1997-12-01

    A new algorithm has been developed to compress oncologic images using both wavelet transform and field masking methods. A compactly supported wavelet transform is used to decompose the original image into high- and low-frequency subband images. The region-of-interest (ROI) inside an image, such as an irradiated field in an electronic portal image, is identified using an image segmentation technique and is then used to generate a mask. The wavelet transform coefficients outside the mask region are then ignored so that these coefficients can be efficiently coded to minimize the image redundancy. In this study, an adaptive uniform scalar quantization method and Huffman coding with a fixed code book are employed in subsequent compression procedures. Three types of typical oncologic images are tested for compression using this new algorithm: CT, MRI, and electronic portal images with 256 x 256 matrix size and 8-bit gray levels. Peak signal-to-noise ratio (PSNR) is used to evaluate the quality of reconstructed image. Effects of masking and image quality on compression ratio are illustrated. Compression ratios obtained using wavelet transform with and without masking for the same PSNR are compared for all types of images. The addition of masking shows an increase of compression ratio by a factor of greater than 1.5. The effect of masking on the compression ratio depends on image type and anatomical site. A compression ratio of greater than 5 can be achieved for a lossless compression of various oncologic images with respect to the region inside the mask. Examples of reconstructed images with compression ratio greater than 50 are shown.

  7. On-line simulations of models for backward masking.

    Science.gov (United States)

    Francis, Gregory

    2003-11-01

    Five simulations of quantitative models of visual backward masking are available on the Internet at http://www.psych.purdue.edu/-gfrancis/Publications/BackwardMasking/. The simulations can be run in a Web browser that supports the Java programming language. This article describes the motivation for making the simulations available and gives a brief introduction as to how the simulations are used. The source code is available on the Web page, and this article describes how the code is organized.

  8. Ferromagnetic shadow mask for spray coating of polymer patterns

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Bosco, Filippo; Boisen, Anja

    2013-01-01

    We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties of the sha...... of the shadow mask allow magnetic clamping to the substrate and spray coating of well defined polymer patterns....

  9. How do different brands of size 1 laryngeal mask airway compare with face mask ventilation in a dedicated laryngeal mask airway teaching manikin?

    Science.gov (United States)

    Tracy, Mark Brian; Priyadarshi, Archana; Goel, Dimple; Lowe, Krista; Huvanandana, Jacqueline; Hinder, Murray

    2017-08-11

    International neonatal resuscitation guidelines recommend the use of laryngeal mask airway (LMA) with newborn infants (≥34 weeks' gestation or >2 kg weight) when bag-mask ventilation (BMV) or tracheal intubation is unsuccessful. Previous publications do not allow broad LMA device comparison. To compare delivered ventilation of seven brands of size 1 LMA devices with two brands of face mask using self-inflating bag (SIB). 40 experienced neonatal staff provided inflation cycles using SIB with positive end expiratory pressure (PEEP) (5 cmH2O) to a specialised newborn/infant training manikin randomised for each LMA and face mask. All subjects received prior education in LMA insertion and BMV. 12 415 recorded inflations for LMAs and face masks were analysed. Leak detected was lowest with i-gel brand, with a mean of 5.7% compared with face mask (triangular 42.7, round 35.7) and other LMAs (45.5-65.4) (pmask (triangular 22.8, round 25.8) and other LMAs (14.3-22.0) (pmask (triangular 3.0, round 3.6) and other LMAs (0.6-2.6) (pmask leak and ease of use among seven different brands of LMA tested in a manikin model. This coupled with no partial or complete insertion failures and ease of use suggests i-gel LMA may have an expanded role with newborn resuscitation as a primary resuscitation device. © Article author(s) (or their employer(s) unless otherwise stated in the text of the article) 2017. All rights reserved. No commercial use is permitted unless otherwise expressly granted.

  10. Cloud and Cloud Shadow Masking Using Multi-Temporal Cloud Masking Algorithm in Tropical Environmental

    Science.gov (United States)

    Candra, D. S.; Phinn, S.; Scarth, P.

    2016-06-01

    A cloud masking approach based on multi-temporal satellite images is proposed. The basic idea of this approach is to detect cloud and cloud shadow by using the difference reflectance values between clear pixels and cloud and cloud shadow contaminated pixels. Several bands of satellite image which have big difference values are selected for developing Multi-temporal Cloud Masking (MCM) algorithm. Some experimental analyses are conducted by using Landsat-8 images. Band 3 and band 4 are selected because they can distinguish between cloud and non cloud. Afterwards, band 5 and band 6 are used to distinguish between cloud shadow and clear. The results show that the MCM algorithm can detect cloud and cloud shadow appropriately. Moreover, qualitative and quantitative assessments are conducted using visual inspections and confusion matrix, respectively, to evaluate the reliability of this algorithm. Comparison between this algorithm and QA band are conducted to prove the reliability of the approach. The results show that MCM better than QA band and the accuracy of the results are very high.

  11. Successful training of HEMS personnel in laryngeal mask airway and intubating laryngeal mask airway placement.

    Science.gov (United States)

    Frascone, R J; Pippert, Greg; Heegaard, William; Molinari, Paul; Dries, David

    2008-01-01

    To evaluate laryngeal mask airway (LMA) and intubating laryngeal mask airway (ILMA) placement by helicopter emergency medical services (HEMS) personnel after a comprehensive training program. HEMS flight staff attended a didactic and manikin-based training session for both devices. After this training, they attempted LMA and ILMA placement in live, anesthetized patients in an operating room (OR). Outcome measures included placement success rates with the LMA, ILMA, and endotracheal intubation through the ILMA, time to ventilation, and time to intubation. Success rates and time to ventilation were compared using chi-squared and analysis of variance (ANOVA), respectively. Mean time to ventilation for the first and second placements of both devices was examined with repeated measures ANOVA. There was no difference in successful placement of the LMA compared with the ILMA (100% vs. 91%, P = .15). Ninety-five percent (19/20) of patients were successfully intubated through the ILMA. Time to intubation was 57.1 +/- 55 seconds (range, 20-240). Mean time to ventilation with either device did not differ significantly (36.8 +/- 17 vs. 38.05 +/- 20 seconds; P = .29). Mean time to ventilation for the first and second placement of either the LMA (P = .45) or the ILMA (P = .47) was not statistically different. Trained HEMS flight staff are capable of effectively placing the LMA and ILMA in the operating room after a comprehensive training protocol.

  12. Source Separation via Spectral Masking for Speech Recognition Systems

    Directory of Open Access Journals (Sweden)

    Gustavo Fernandes Rodrigues

    2012-12-01

    Full Text Available In this paper we present an insight into the use of spectral masking techniques in time-frequency domain, as a preprocessing step for the speech signal recognition. Speech recognition systems have their performance negatively affected in noisy environments or in the presence of other speech signals. The limits of these masking techniques for different levels of the signal-to-noise ratio are discussed. We show the robustness of the spectral masking techniques against four types of noise: white, pink, brown and human speech noise (bubble noise. The main contribution of this work is to analyze the performance limits of recognition systems  using spectral masking. We obtain an increase of 18% on the speech hit rate, when the speech signals were corrupted by other speech signals or bubble noise, with different signal-to-noise ratio of approximately 1, 10 and 20 dB. On the other hand, applying the ideal binary masks to mixtures corrupted by white, pink and brown noise, results an average growth of 9% on the speech hit rate, with the same different signal-to-noise ratio. The experimental results suggest that the masking spectral techniques are more suitable for the case when it is applied a bubble noise, which is produced by human speech, than for the case of applying white, pink and brown noise.

  13. Line Search-Based Inverse Lithography Technique for Mask Design

    Directory of Open Access Journals (Sweden)

    Xin Zhao

    2012-01-01

    Full Text Available As feature size is much smaller than the wavelength of illumination source of lithography equipments, resolution enhancement technology (RET has been increasingly relied upon to minimize image distortions. In advanced process nodes, pixelated mask becomes essential for RET to achieve an acceptable resolution. In this paper, we investigate the problem of pixelated binary mask design in a partially coherent imaging system. Similar to previous approaches, the mask design problem is formulated as a nonlinear program and is solved by gradient-based search. Our contributions are four novel techniques to achieve significantly better image quality. First, to transform the original bound-constrained formulation to an unconstrained optimization problem, we propose a new noncyclic transformation of mask variables to replace the wellknown cyclic one. As our transformation is monotonic, it enables a better control in flipping pixels. Second, based on this new transformation, we propose a highly efficient line search-based heuristic technique to solve the resulting unconstrained optimization. Third, to simplify the optimization, instead of using discretization regularization penalty technique, we directly round the optimized gray mask into binary mask for pattern error evaluation. Forth, we introduce a jump technique in order to jump out of local minimum and continue the search.

  14. Soyinka and Yoruba Sculpture: Masks of Deification and Symbolism

    Directory of Open Access Journals (Sweden)

    Gilbert Tarka Fai

    2010-01-01

    Full Text Available The Yoruba mask is a piece of sculpture that is both artistic and functional. The carved work fulfils one or more of several functions—sacred or profane, personal or communal, serious or satirical. As an object it has only its relatively insignificant quota of vital energy that is found, according to African ontology, in all matter and substance of the visible world- animal, vegetable and mineral. But the Yoruba mask also has a force that extends to the world of spirits and gods. These masks also have the dual effect of transforming the wearer and the ambivalence of serving good and evil ends. This indicates that the Yoruba mask apart from its spiritual essence is a symbol of great complexity and ambiguity. It is from this great community of sculptors and from the ambivalent quality of the mask as image and symbol that some of Wole Soyinka’s creative writings emerge. This paper argues that Wole Soyinka uses his native Yoruba sculpture, and the mask in particular, to dramatise the essential spiritual continuity of human nature through the dramatic appearance of gods and the spirits of the ancestors in the world of the living during the dance of possession.

  15. A pattern-based method to automate mask inspection files

    Science.gov (United States)

    Kamal Baharin, Ezni Aznida Binti; Muhsain, Mohamad Fahmi Bin; Ahmad Ibrahim, Muhamad Asraf Bin; Ahmad Noorhani, Ahmad Nurul Ihsan Bin; Sweis, Jason; Lai, Ya-Chieh; Hurat, Philippe

    2017-03-01

    Mask inspection is a critical step in the mask manufacturing process in order to ensure all dimensions printed are within the needed tolerances. This becomes even more challenging as the device nodes shrink and the complexity of the tapeout increases. Thus, the amount of measurement points and their critical dimension (CD) types are increasing to ensure the quality of the mask. In addition to the mask quality, there is a significant amount of manpower needed when the preparation and debugging of this process are not automated. By utilizing a novel pattern search technology with the ability to measure and report match region scan-line (edge) measurements, we can create a flow to find, measure and mark all metrology locations of interest and provide this automated report to the mask shop for inspection. A digital library is created based on the technology product and node which contains the test patterns to be measured. This paper will discuss how these digital libraries will be generated and then utilized. As a time-critical part of the manufacturing process, this can also reduce the data preparation cycle time, minimize the amount of manual/human error in naming and measuring the various locations, reduce the risk of wrong/missing CD locations, and reduce the amount of manpower needed overall. We will also review an example pattern and how the reporting structure to the mask shop can be processed. This entire process can now be fully automated.

  16. Dissolution methodology for taste masked oral dosage forms.

    Science.gov (United States)

    Gittings, Sally; Turnbull, Neil; Roberts, Clive J; Gershkovich, Pavel

    2014-01-10

    Conventional adult dosage forms are often not suitable for the paediatric and geriatric populations due to either swallowing difficulties or patient repulsion and a requirement for tailored dosing to individual compliance or physiological needs. Alternative formulations are available; however these often require the incorporation of more complex taste masking techniques. One approach to taste masking is to reduce contact between the bitter Active Pharmaceutical Ingredient (API) and oral cavity taste bud regions. This is achieved by hindering release in the oral cavity, or including competitive inhibition of bitter sensation for example by using flavours or sweeteners. There may also be other sensational complications from the API such as residual burning, reflux or metallic taste sensations to deal with. In vitro dissolution testing is employed to elucidate taste masking capability by quantifying release of the drug in simulated oral cavity conditions. Dissolution testing approaches may also be used to potentially predict or quantify the effect of the taste masking technique on the resultant pharmacokinetic profile. The present review investigates the anatomy and physiology of the oral cavity and current approaches to taste masking. In vitro dissolution methodologies adopted in the evaluation of taste masked formulations are discussed for their relative merits and drawbacks. A vast array of methodologies has been employed, with little agreement between approaches, and a lack of biorelevance. Future directions in dissolution methodology such as TNO Intestinal Model (TIM) and the Artificial Stomach and Duodenum model (ASD) are also discussed.

  17. The time-course of visual masking effects on saccadic responses indicates that masking interferes with reentrant processing

    DEFF Research Database (Denmark)

    Crouzet, S.; Pin, Simon Hviid Del; Overgaard, Morten;

    2013-01-01

    with reentrant processing, then the first feedforward sweep should be left relatively intact. Using a standard OSM paradigm in combination with a saccadic choice task, giving access to an early phase of visual processing (the fastest saccades occurring only 100 ms after target onset), we compared the masking...... time-course of OSM, noise backward masking, as well as a simple target contrast decrease. Consistently with a reentrant account, a significantly stronger masking effect was observed for slow (larger than median RT; average median RT = 177 ms) relatively to fast saccades in the OSM condition......Object substitution masking (OSM) occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. Here, we tested the widespread assumption that OSM selectively impairs reentrant processing. If OSM interferes selectively...

  18. A procedure and program to calculate shuttle mask advantage

    Science.gov (United States)

    Balasinski, A.; Cetin, J.; Kahng, A.; Xu, X.

    2006-10-01

    A well-known recipe for reducing mask cost component in product development is to place non-redundant elements of layout databases related to multiple products on one reticle plate [1,2]. Such reticles are known as multi-product, multi-layer, or, in general, multi-IP masks. The composition of the mask set should minimize not only the layout placement cost, but also the cost of the manufacturing process, design flow setup, and product design and introduction to market. An important factor is the quality check which should be expeditious and enable thorough visual verification to avoid costly modifications once the data is transferred to the mask shop. In this work, in order to enable the layer placement and quality check procedure, we proposed an algorithm where mask layers are first lined up according to the price and field tone [3]. Then, depending on the product die size, expected fab throughput, and scribeline requirements, the subsequent product layers are placed on the masks with different grades. The actual reduction of this concept to practice allowed us to understand the tradeoffs between the automation of layer placement and setup related constraints. For example, the limited options of the numbers of layer per plate dictated by the die size and other design feedback, made us consider layer pairing based not only on the final price of the mask set, but also on the cost of mask design and fab-friendliness. We showed that it may be advantageous to introduce manual layer pairing to ensure that, e.g., all interconnect layers would be placed on the same plate, allowing for easy and simultaneous design fixes. Another enhancement was to allow some flexibility in mixing and matching of the layers such that non-critical ones requiring low mask grade would be placed in a less restrictive way, to reduce the count of orphan layers. In summary, we created a program to automatically propose and visualize shuttle mask architecture for design verification, with

  19. Correction: Inferior alveolar nerve injury with laryngeal mask airway: a case report.

    LENUS (Irish Health Repository)

    Hanumanthaiah, Deepak

    2011-11-30

    ABSTRACT: Following the publication of our article [Inferior alveolar nerve injury with laryngeal mask airway: a case report. Journal of Medical Case Reports 2011, 5:122] it was brought to our attention that we inadvertently used the registered trademark of the Laryngeal Mask Company Limited (LMA) as the abbreviation for laryngeal mask airway. A Portex(R) Soft Seal(R) Laryngeal Mask was used and not a device manufactured by the Laryngeal Mask Company.

  20. Quality of patient positioning during cerebral tomotherapy irradiation using different mask systems

    Energy Technology Data Exchange (ETDEWEB)

    Leitzen, C.; Wilhelm-Buchstab, T.; Garbe, S.; Luetter, C.; Muedder, T.; Simon, B.; Schild, H.H.; Schueller, H. [Universitaetsklinik Bonn, Radiologische Klinik, FE Strahlentherapie, Bonn (Germany)

    2014-04-15

    Patient immobilization during brain tumor radiotherapy is achieved by employing different mask systems. Two innovative mask systems were developed to minimize the problems of claustrophobic patients. Our aim was to evaluate whether the quality of patient immobilization using the new mask systems was equivalent to the standard mask system currently in use. Thirty-three patients with cerebral target volumes were irradiated using the Hi-Art II tomotherapy system between 2010 and 2012. Each group of 11 patients was fitted with one of the two new mask systems (Crystal {sup registered} or Open Face {sup registered} mask, Orfit) or the standard three-point mask (Raycast {sup registered} -HP, Orfit) and a total of 557 radiotherapy fractions were evaluated. After positioning was checked by MV-CT, the necessary table adjustments were noted. Data were analyzed by comparing the groups, and safety margins were calculated for nonimage-guided irradiation. The mean values of the table adjustments were: (a) lateral (mm): -0.22 (mask 1, standard deviation (σ): 2.15); 1.1 (mask 2, σ: 2.4); -0.64 (mask 3, σ: 2.9); (b) longitudinal (mm): -1 (mask 1, σ: 2.57); -0.5 (mask 2, σ: 4.7); -1.22 (mask 3, σ: 2.52); (c) vertical (mm): 0.62 (mask 1, σ: 0.63); 1.2 (mask 2, σ: 1.0); 0.57 (mask 3, σ: 0.28); (d) roll: 0.35 (mask 1, σ: 0.75); 0 (mask 2, σ: 0.8); 0.02 (mask 3, σ: 1.12). The outcomes suggest necessary safety margins of 5.49-7.38 mm (lateral), 5.4-6.56 mm (longitudinal), 0.82-3.9 mm (vertical), and 1.93-4.5 (roll). There were no significant differences between the groups. The new mask systems improve patient comfort while providing consistent patient positioning. (orig.)

  1. Scanning coherent scattering methods for actinic EUV mask inspection

    Science.gov (United States)

    Ekinci, Y.; Helfenstein, P.; Rajeev, R.; Mochi, I.; Mohacsi, I.; Gobrecht, J.; Yoshitake, S.

    2016-10-01

    Actinic mask inspection for EUV lithography with targeted specifications of resolution, sensitivity, and throughput remains a big hurdle for the successful insertion of EUVL into high volume manufacturing and effective solutions are needed to address this. We present a method for actinic mask inspection based on scanning coherent scattering microscopy. In this method, the mask is scanned with an EUV beam of relatively small spot size and the scattered light is recorded with a pixel detector. Customized algorithms reconstruct the aerial image by iteratively solving the phaseproblem using over-determined diffraction data gathered by scanning across the specimen with a finite illumination. This approach provides both phase and amplitude of actinic aerial images of the mask with high resolution without the need to use high NA (numerical aperture) lenses. Futher, we describe a reflective mode EUV mask scanning lensless imaging tool (RESCAN), which was installed at the XIL-II beamline and later at the SIM beamline of the Swiss Light Source and show reconstructed aerial images down to 10 nm (on-wafer) resolution. As a complementary method, the a-priori knowledge of the sample is employed to identify potential defect sites by analyzing the diffraction patterns. In this method, the recorded diffraction patterns are compared with the die or database data (i.e. previously measured or calculated diffraction data from the defect-free mask layout respectively) and their difference is interpreted as the defect signal. Dynamic software filtering helps to suppress the strong diffraction from defect-free structures and allows registration of faint defects with high sensitivity. Here, we discuss the basic principles of these Fourier domain techniques and its potential for actinic mask inspection with high signal-to-noise ratio and high throughput.

  2. Defects caused by blank masks and repair solution with nanomachining for 20nm node

    Science.gov (United States)

    Lee, HyeMi; Kim, ByungJu; Kim, MunSik; Jung, HoYong; Kim, Sang Pyo; Yim, DongGyu

    2014-09-01

    As the number of masks per wafer product set is increasing and low k1 lithography requires tight mask specifications, the patterning process below sub 20nm tech. node for critical layers will be much more expensive compared with previous tech. generations. Besides, the improved resolution and the zero defect level are necessary to meet tighter specifications on a mask and these resulted in the increased the blank mask price as well as the mask fabrication cost. Unfortunately, in spite of expensive price of blank masks, the certain number of defects on the blank mask is transformed into the mask defects and its ratio is increased. But using high quality blank mask is not a good idea to avoid defects on the blank mask because the price of a blank mask is proportional to specifications related to defect level. Furthermore, particular defects generated from the specific process during manufacturing a blank mask are detected as a smaller defect than real size by blank inspection tools because of its physical properties. As a result, it is almost impossible to prevent defects caused by blank masks during the mask manufacturing. In this paper, blank defect types which is evolved into mask defects and its unique characteristics are observed. Also, the repair issues are reviewed such as the pattern damage according to the defect types and the repair solution is suggested to satisfy the AIMS (Arial Image Measurement System) specification using a nanomachining tool.

  3. Extreme ultraviolet lithography mask etch study and overview

    Science.gov (United States)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  4. A Dual-Mode Actinic EUV Mask Inspection Tool

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Y; Barty, A; Gullikson, E; S.Taylor, J; Liddle, J A; Wood, O

    2005-03-21

    To qualify the performance of non-actinic inspection tools, a novel EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron facility at Lawrence Berkeley National Laboratory. Similar to the older generation actinic mask inspection tool, the new system can operate in scanning mode, when mask blanks are scanned for defects using 13.5-nm in-band radiation to identify and map all locations on the mask that scatter a significant amount of EUV light. By modifying and optimizing beamline optics (11.3.2 at ALS) and replacing K-B focusing mirrors with a high quality Schwarzschild illuminator, the new system achieves an order of magnitude improvement on in-band EUV flux density at the mask, enabling faster scanning speed and higher sensitivity to smaller defects. Moreover, the system can also operate in imaging mode, when it becomes a zone-plate-based full-field EUV microscope with spatial resolution better than 100 nm. The microscope utilizes an off-axis setup, making it possible to obtain bright field images over a field-of-view of 5 x 5 {micro}m.

  5. Economics of automation for the design-to-mask interface

    Science.gov (United States)

    Erck, Wesley

    2009-04-01

    Mask order automation has increased steadily over the years through a variety of individual mask customer implementations. These have been supported by customer-specific software at the mask suppliers to support the variety of customer output formats. Some customers use the SEMI P10 1 standard, some use supplier-specific formats, and some use customer-specific formats. Some customers use little automation and depend instead on close customer-supplier relationships. Implementations are varied in quality and effectiveness. A major factor which has prolonged the adoption of more advanced and effective solutions has been a lack of understanding of the economic benefits. Some customers think standardized automation mainly benefits the mask supplier in order entry automation, but this ignores a number of other significant benefits which differ dramatically for each party in the supply chain. This paper discusses the nature of those differing advantages and presents simple models suited to four business cases: integrated device manufacturers (IDM), fabless companies, foundries and mask suppliers. Examples and estimates of the financial advantages for these business types will be shown.

  6. Perceptual masking of boar taint in Swedish fermented sausages.

    Science.gov (United States)

    Stolzenbach, Sandra; Lindahl, Gunilla; Lundström, Kerstin; Chen, Gang; Byrne, Derek V

    2009-04-01

    Surgical castration of male piglets has traditionally been practiced to avoid development of boar taint in pork meat which can occur if entire male pigs are raised. Boar taint is commonly characterised as exhibiting the odour and flavour of urine and manure. This study involves sensory characterisation of the possibilities to mask boar taint in meat from entire male pigs by fermentation and smoking to maintain high sensory quality in meat products if castration is prohibited. Model and commercial type Swedish fermented sausage products based on low or high levels of boar tainted fat, three different starter cultures and two different levels of smoking were studied. In the model sausages, liquid smoke masked the perception of boar taint. In contrast, the smoking procedure of the commercial sausages was insufficient to totally mask the perception of boar taint. In both the model and commercial sausages, the aroma development from the starter cultures lowered the perception of boar taint but was insufficient for total perceptual masking. Due to the total masking effect of smoking in the model sausages, it was clear that smoke may present a potential solution to remove the perception of boar taint in fermented sausages if the smoking procedure is optimised.

  7. Phonological and Orthographic Overlap Effects in Fast and Masked Priming

    Science.gov (United States)

    Frisson, Steven; Bélanger, Nathalie N.; Rayner, Keith

    2014-01-01

    We investigated how orthographic and phonological information is activated during reading, using a fast priming task, and during single word recognition, using masked priming. Specifically, different types of overlap between prime and target were contrasted: high orthographic and high phonological overlap (track-crack), high orthographic and low phonological overlap (bear-gear), or low orthographic and high phonological overlap (fruit-chute). In addition, we examined whether (orthographic) beginning overlap (swoop-swoon) yielded the same priming pattern as end (rhyme) overlap (track-crack). Prime durations were 32 and 50ms in the fast priming version, and 50ms in the masked priming version, and mode of presentation (prime and target in lower case) was identical. The fast priming experiment showed facilitatory priming effects when both orthography and phonology overlapped, with no apparent differences between beginning and end overlap pairs. Facilitation was also found when prime and target only overlapped orthographically. In contrast, the masked priming experiment showed inhibition for both types of end overlap pairs (with and without phonological overlap), and no difference for begin overlap items. When prime and target only shared principally phonological information, facilitation was only found with a long prime duration in the fast priming experiment, while no differences were found in the masked priming version. These contrasting results suggest that fast priming and masked priming do not necessarily tap into the same type of processing. PMID:24365065

  8. Phonological and orthographic overlap effects in fast and masked priming.

    Science.gov (United States)

    Frisson, Steven; Bélanger, Nathalie N; Rayner, Keith

    2014-01-01

    We investigated how orthographic and phonological information is activated during reading, using a fast priming task, and during single-word recognition, using masked priming. Specifically, different types of overlap between prime and target were contrasted: high orthographic and high phonological overlap (track-crack), high orthographic and low phonological overlap (bear-gear), or low orthographic and high phonological overlap (fruit-chute). In addition, we examined whether (orthographic) beginning overlap (swoop-swoon) yielded the same priming pattern as end (rhyme) overlap (track-crack). Prime durations were 32 and 50 ms in the fast priming version and 50 ms in the masked priming version, and mode of presentation (prime and target in lower case) was identical. The fast priming experiment showed facilitatory priming effects when both orthography and phonology overlapped, with no apparent differences between beginning and end overlap pairs. Facilitation was also found when prime and target only overlapped orthographically. In contrast, the masked priming experiment showed inhibition for both types of end overlap pairs (with and without phonological overlap) and no difference for begin overlap items. When prime and target only shared principally phonological information, facilitation was only found with a long prime duration in the fast priming experiment, while no differences were found in the masked priming version. These contrasting results suggest that fast priming and masked priming do not necessarily tap into the same type of processing.

  9. Mask roughness induced LER: geometric model at long correlation lengths

    Energy Technology Data Exchange (ETDEWEB)

    McClinton, Brittany M.; Naulleau, Patrick P.

    2011-02-11

    Collective understanding of how both the resist and line-edge roughness (LER) on the mask affect the final printed LER has made significant advances. What is poorly understood, however, is the extent to which mask surface roughness couples to image plane LER as a function of illumination conditions, NA, and defocus. Recently, progress has been made in formulating a simplified solution for mask roughness induced LER. Here, we investigate the LER behavior at long correlation lengths of surface roughness on the mask. We find that for correlation lengths greater than 3/NA in wafer dimensions and CDs greater than approximately 0.75/NA, the previously described simplified model, which remains based on physical optics, converges to a 'geometric regime' which is based on ray optics and is independent of partial coherence. In this 'geometric regime', the LER is proportional to the mask slope error as it propagates through focus, and provides a faster alternative to calculating LER in contrast to either full 2D aerial image simulation modeling or the newly proposed physical optics model. Data is presented for both an NA = 0.32 and an NA = 0.5 imaging system for CDs of 22-nm and 50-nm horizontal-line-dense structures.

  10. UV-NIL mask making and imprint evaluation

    Science.gov (United States)

    Fujii, Akiko; Sakai, Yuko; Mizuochi, Jun; Hiraka, Takaaki; Yusa, Satoshi; Kuriyama, Koki; Sakaki, Masashi; Sutou, Takanori; Sasaki, Shiho; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

    2008-05-01

    UV NIL shows excellent resolution capability with remarkable low line edge roughness, and has been attracting pioneers in the industry who were searching for the finest patterns. We have been focused on the resolution improvement in mask making, and with a 100kV acceleration voltage EB writer process, we have achieved down to 18nm resolution, and have established a mask making process to meet the requirements of the pioneers. Usually such masks needed just a small field (several hundred microns square or so). Now, UV NIL exploration seems to have reached the step of feasibility study for mass production. Here, instead of a small field, a full chip field mask is required, though the resolution demand is not as tough as for the extremely advanced usage. The 100kV EB writers are adopting spot beams to generate the pattern and have a fatally low throughput if we need full chip writing. In this work, we focused on the 50keV variable shaped beam (VSB) EB writers, which are used in current 4X photomask manufacturing. The 50kV VSB writers can generate full chip pattern in a reasonable time, and by choosing the right patterning material and process, we could achieve resolution down to 32nm. Our initial results of 32nm class NIL masks with full chip field size will be shown and resolution improvement plan to further technology nodes will be discussed.

  11. Effect of Mask Regions on Weak Lensing Statistics

    CERN Document Server

    Shirasaki, Masato; Hamana, Takashi

    2013-01-01

    Sky masking is unavoidable in wide-field weak lensing observations. We study how masks affect the measurement of statistics of matter distribution probed by weak gravitational lensing. We first use 1000 Gaussian simulations in order to examine in detail the impact of mask regions on the weak lensing Minkowski Functionals (MFs). We consider actual sky masks used for a Subaru Suprime-Cam imaging survey. The masks increase the variance of the convergence field and thus the expected values of the MFs are biased even for a Gaussian random field. The bias is caused by two effects. One is owing to the reduced number of sampling Fourier modes, which can be accounted for analytically by considering the survey geometry appropriately. The other is owing to variation of the variance of the convergence field for each field of view. Lensing MFs are biased systematically when the reconstructed convergence field is normalized by its variance. We then use a large number of cosmological ray-tracing simulations in order to addr...

  12. Social mask or persona in Tennesse Williams's women chracters

    Directory of Open Access Journals (Sweden)

    Filiz Çevik Tan

    2014-04-01

    Full Text Available Common etymon of word “personality” in foreign languages is based on the word “persona”. Meaning of the word “persona”, in latin, is the mask the stage actors use. Jung, defining the “Persona” as a concept within the scope of analytic psychology, sees it as a functional cover, a form of spiritual behavior, which responds to daily needs of the person. When both definitions are read simultaneously the “persona” shall become the “social mask”. In brief; in order to receive acknowledgement-and not to be excluded, and to acquire some sort of things, social masks (personas suitable with communal codes that one is a part of are used. Our social masks in this sense are our face that people around us see and recognize. Maintaining the personality within “normal” borders is dependent on persona’s motion and its transmutation when needed. Play characters, too, have social masks. In this study, a review was performed out of chosen play scripts on play persons who use the social masks that undertake key roles in the stack of encoded social relationships.

  13. Alternating phase shift mask technology for 65nm logic applications

    Science.gov (United States)

    Chakravorty, Kishore K.; Henrichs, Sven; Qiu, Wei; Chavez, Joas L.; Liu, Yi-Ping; Ghadiali, Firoz; Yung, Karmen; Wilcox, Nathan; Silva, Mary; Ma, Jian; Qu, Ping; Irvine, Brian; Yun, Henry; Cheng, Wen-Hao; Farnsworth, Jeff

    2006-03-01

    Alternating Phase Shift Mask (APSM) Technology has been developed and successfully implemented for the poly gate of 65nm node Logic application at Intel. This paper discusses the optimization of the mask design rules and fabrication process in order to enable high volume manufacturability. Intel's APSM technology is based on a dual sided trenched architecture. To meet the stringent OPC requirements associated with patterning of narrow gates required for the 65nm node, Chrome width between the Zero and Pi aperture need to be minimized. Additionally, APSM lithography has an inherently low MEEF that furthermore, drives a narrower Chrome line as compared to the Binary approach. The double sided trenched structure with narrow Chrome lines are mechanically vulnerable and prone to damage when exposed to conventional mask processing steps. Therefore, new processing approaches were developed to minimize the damage to the patterned mask features. For example, cleaning processes were optimized to minimize Chrome & quartz damage while retaining the cleaning effectiveness. In addition, mask design rules were developed which ensured manufacturability. The narrow Chrome regions between the zero and Pi apertures severely restrict the tolerance for the placement of the second level resists edges with respect to the first level. UV Laser Writer based resist patterning capability, capable of providing the required Overlay tolerance, was developed, An AIMS based methodology was used to optimize the undercut and minimize the aerial image CD difference between the Zero and Pi apertures.

  14. AN IMAGE-PLANE ALGORITHM FOR JWST'S NON-REDUNDANT APERTURE MASK DATA

    Energy Technology Data Exchange (ETDEWEB)

    Greenbaum, Alexandra Z. [Johns Hopkins University Department of Physics and Astronomy 3400 North Charles, Baltimore, MD 21218 (United States); Pueyo, Laurent; Sivaramakrishnan, Anand [Space Telescope Science Institute, 3700 San Martin Drive, Baltimore, MD 21218 (United States); Lacour, Sylvestre [LESIA, CNRS/UMR-8109, Observatoire de Paris, UPMC, Université Paris Diderot 5 place Jules Janssen, 92195 Meudon (France)

    2015-01-10

    The high angular resolution technique of non-redundant masking (NRM) or aperture masking interferometry (AMI) has yielded images of faint protoplanetary companions of nearby stars from the ground. AMI on James Webb Space Telescope (JWST)'s Near Infrared Imager and Slitless Spectrograph (NIRISS) has a lower thermal background than ground-based facilities and does not suffer from atmospheric instability. NIRISS AMI images are likely to have 90%-95% Strehl ratio between 2.77 and 4.8 μm. In this paper we quantify factors that limit the raw point source contrast of JWST NRM. We develop an analytic model of the NRM point spread function which includes different optical path delays (pistons) between mask holes and fit the model parameters with image plane data. It enables a straightforward way to exclude bad pixels, is suited to limited fields of view, and can incorporate effects such as intra-pixel sensitivity variations. We simulate various sources of noise to estimate their effect on the standard deviation of closure phase, σ{sub CP} (a proxy for binary point source contrast). If σ{sub CP} < 10{sup –4} radians—a contrast ratio of 10 mag—young accreting gas giant planets (e.g., in the nearby Taurus star-forming region) could be imaged with JWST NIRISS. We show the feasibility of using NIRISS' NRM with the sub-Nyquist sampled F277W, which would enable some exoplanet chemistry characterization. In the presence of small piston errors, the dominant sources of closure phase error (depending on pixel sampling, and filter bandwidth) are flat field errors and unmodeled variations in intra-pixel sensitivity. The in-flight stability of NIRISS will determine how well these errors can be calibrated by observing a point source. Our results help develop efficient observing strategies for space-based NRM.

  15. Comparison of sevoflurane with isoflurane for rapid mask induction in midazolam and butorphanol-sedated dogs.

    Science.gov (United States)

    Mutoh, T; Kojima, K; Takao, K; Nishimura, R; Sasaki, N

    2001-05-01

    Rapid mask induction can be a useful induction technique for veterinary patients, although it is often accompanied by exaggerated excitement responses in unpremedicated animals (Mutoh et al.: Jpn. J. Vet. Anesth. Surg. 26, 109-116; J. Vet. Med. Sci. 57, 1007-1013; J. Vet. Med. Sci. 57, 1121-1124; 1995). The aim of this study was to compare sevoflurane with isoflurane for rapid mask induction in six dogs sedated by a combination of midazolam (0.1 mg/kg) and butorphanol (0.2 mg/kg). Induction with sevoflurane (5%, 2.4 minimum alveolar concentration [MAC]) in O2 resulted in shorter time to loss of the palpebral reflex, negative tail clamp response, and successful intubation than with isoflurane (3%, 2.4 MAC) in O2. There were no changes in heart rate or mean arterial blood pressure during induction with sevoflurane, whereas an increase in heart rate was observed in dogs induced with isoflurane. A decrease in respiratory rate compared with the pre-induction rate was observed during induction, and associated mild respiratory acidosis, characterized by an increase in arterial PCO2, was measured at the end of the induction period in both induction groups. None of the animals had episodes of induction-related complications. These results suggest that both sevoflurane and isoflurane produce a smooth onset of induction in midazolam and butorphanol-sedated dogs. Sevoflurane is a more suitable for rapid mask induction than isoflurane since it provides faster induction associated with a lower blood/gas partition coefficient.

  16. Low flow anesthesia: Efficacy and outcome of laryngeal mask airway versus pressure-optimized cuffed-endotracheal tube

    Directory of Open Access Journals (Sweden)

    El-Seify Zeinab

    2010-01-01

    Full Text Available Background: Low flow anesthesia can lead to reduction of anesthetic gas and vapor consumption. Laryngeal mask airway (LMA has proved to be an effective and safe airway device. The aim of this study is to assess the feasibility of laryngeal mask airway during controlled ventilation using low fresh gas flow (1.0 L/min as compared to endotracheal tube (ETT. Patients and Methods : Fifty nine non-smoking adult patients; ASA I or II, being scheduled for elective surgical procedures, with an expected duration of anesthesia 60 minutes or more, were randomly allocated into two groups - Group I (29 patients had been ventilated using LMA size 4 for females and 5 for males respectively; and Group II (30 patients were intubated using ETT. After 10 minutes of high fresh gas flow, the flow was reduced to 1 L/min. Patients were monitored for airway leakage, end-tidal CO 2 (ETCO 2 , inspiratory and expiratory isoflurane and nitrous oxide fraction concentrations, and postoperative airway-related complications Results : Two patients in the LMA-group developed initial airway leakage (6.9% versus no patient in ETT-group. Cough and sore throat were significantly higher in ETT patients. There were no evidences of differences between both groups regarding ETCO 2 , uptake of gases, nor difficulty in swallowing. Conclusion : The laryngeal mask airway proved to be effective and safe in establishing an airtight seal during controlled ventilation under low fresh gas flow of 1 L/min, inducing less coughing and sore throat during the immediate postoperative period than did the ETT, with continuous measurement and readjustment of the tube cuff pressure.

  17. Design study of a movable mask with low beam impedance

    Directory of Open Access Journals (Sweden)

    Y. Suetsugu

    2006-10-01

    Full Text Available A novel design of a movable mask (collimator for high-current accelerators is proposed. The mask head is supported by a ceramic rod to reduce interference with the beam. One side of the support is coated with a thin (∼1   μm conductive material to avoid extra charge up of the head. The head is also made of ceramics to avoid direct damage from an intense beam. To investigate the availability of the new movable mask, the rf properties, such as the impedances of trapped modes and the loss factors, were evaluated by simulation codes. The frequencies and the Q values of the trapped modes were also measured using a test model, and compared with calculated ones. Two trial modes for KEKB are being manufactured, and will be tested with beams next year.

  18. An aperture masking mode for the MICADO instrument

    CERN Document Server

    Lacour, S; Gendron, E; Boccaletti, A; Galicher, R; Clénet, Y; Gratadour, D; Buey, T; Rousset, G; Hartl, M; Davies, R

    2014-01-01

    MICADO is a near-IR camera for the Europea ELT, featuring an extended field (75" diameter) for imaging, and also spectrographic and high contrast imaging capabilities. It has been chosen by ESO as one of the two first-light instruments. Although it is ultimately aimed at being fed by the MCAO module called MAORY, MICADO will come with an internal SCAO system that will be complementary to it and will deliver a high performance on axis correction, suitable for coronagraphic and pupil masking applications. The basis of the pupil masking approach is to ensure the stability of the optical transfer function, even in the case of residual errors after AO correction (due to non common path errors and quasi-static aberrations). Preliminary designs of pupil masks are presented. Trade-offs and technical choices, especially regarding redundancy and pupil tracking, are explained.

  19. Application of stencil masks for ion beam lithographic patterning

    Energy Technology Data Exchange (ETDEWEB)

    Brun, S., E-mail: sebastien.brun@he-arc.ch [Institut des Microtechnologies Appliquées, Haute Ecole Arc Ingénierie, Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Savu, V. [Laboratoire des Microsystèmes (LMIS), Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland); Schintke, S. [HEIG-VD, University of Applied Sciences of Western Switzerland, Institut de Micro et Nano Techniques – Laboratory of Applied NanoSciences (MNT-LANS), Route de Cheseaux 1, CH-1401 Yverdon-les-Bains (Switzerland); Guibert, E.; Keppner, H. [Institut des Microtechnologies Appliquées, Haute Ecole Arc Ingénierie, Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Brugger, J. [Laboratoire des Microsystèmes (LMIS), Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland); Whitlow, H.J. [Institut des Microtechnologies Appliquées, Haute Ecole Arc Ingénierie, Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland)

    2013-07-01

    The application of Au/Si{sub 3}N{sub 4} stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist polymers, oxygen ion-induced etching of PTFE and patterning using an etch-stop in silicon. We demonstrate that using different well-known microtechnology material-modification techniques, patterns can be transferred using stencil masks and broad ion beams to nanomachining scenarios. In the case of the etch-stop process; writing of 3D micropatterns with different height levels was achieved using a broad beam. The stencil masks were found to be durable with no obvious deterioration and well suited for exposure of large areas.

  20. Mask data processing in the era of multibeam writers

    Science.gov (United States)

    Abboud, Frank E.; Asturias, Michael; Chandramouli, Maesh; Tezuka, Yoshihiro

    2014-10-01

    Mask writers' architectures have evolved through the years in response to ever tightening requirements for better resolution, tighter feature placement, improved CD control, and tolerable write time. The unprecedented extension of optical lithography and the myriad of Resolution Enhancement Techniques have tasked current mask writers with ever increasing shot count and higher dose, and therefore, increasing write time. Once again, we see the need for a transition to a new type of mask writer based on massively parallel architecture. These platforms offer a step function improvement in both dose and the ability to process massive amounts of data. The higher dose and almost unlimited appetite for edge corrections open new windows of opportunity to further push the envelope. These architectures are also naturally capable of producing curvilinear shapes, making the need to approximate a curve with multiple Manhattan shapes unnecessary.

  1. Vitreous carbon mask substrate for X-ray lithography

    Science.gov (United States)

    Aigeldinger, Georg [Livermore, CA; Skala, Dawn M [Fremont, CA; Griffiths, Stewart K [Livermore, CA; Talin, Albert Alec [Livermore, CA; Losey, Matthew W [Livermore, CA; Yang, Chu-Yeu Peter [Dublin, CA

    2009-10-27

    The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.

  2. Characterization of Graphene-based FET Fabricated using a Shadow Mask

    Science.gov (United States)

    Tien, Dung Hoang; Park, Jun-Young; Kim, Ki Buem; Lee, Naesung; Seo, Yongho

    2016-05-01

    To pattern electrical metal contacts, electron beam lithography or photolithography are commonly utilized, and these processes require polymer resists with solvents. During the patterning process the graphene surface is exposed to chemicals, and the residue on the graphene surface was unable to be completely removed by any method, causing the graphene layer to be contaminated. A lithography free method can overcome these residue problems. In this study, we use a micro-grid as a shadow mask to fabricate a graphene based field-effect-transistor (FET). Electrical measurements of the graphene based FET samples are carried out in air and vacuum. It is found that the Dirac peaks of the graphene devices on SiO2 or on hexagonal boron nitride (hBN) shift from a positive gate voltage region to a negative region as air pressure decreases. In particular, the Dirac peaks shift very rapidly when the pressure decreases from ~2 × 10‑3 Torr to ~5 × 10‑5 Torr within 5 minutes. These Dirac peak shifts are known as adsorption and desorption of environmental gases, but the shift amounts are considerably different depending on the fabrication process. The high gas sensitivity of the device fabricated by shadow mask is attributed to adsorption on the clean graphene surface.

  3. 3D Printing All-Aromatic Polyimides using Mask-Projection Stereolithography: Processing the Nonprocessable.

    Science.gov (United States)

    Hegde, Maruti; Meenakshisundaram, Viswanath; Chartrain, Nicholas; Sekhar, Susheel; Tafti, Danesh; Williams, Christopher B; Long, Timothy E

    2017-08-01

    High-performance, all-aromatic, insoluble, engineering thermoplastic polyimides, such as pyromellitic dianhydride and 4,4'-oxydianiline (PMDA-ODA) (Kapton), exhibit exceptional thermal stability (up to ≈600 °C) and mechanical properties (Young's modulus exceeding 2 GPa). However, their thermal resistance, which is a consequence of the all-aromatic molecular structure, prohibits processing using conventional techniques. Previous reports describe an energy-intensive sintering technique as an alternative technique for processing polyimides with limited resolution and part fidelity. This study demonstrates the unprecedented 3D printing of PMDA-ODA using mask-projection stereolithography, and the preparation of high-resolution 3D structures without sacrificing bulk material properties. Synthesis of a soluble precursor polymer containing photo-crosslinkable acrylate groups enables light-induced, chemical crosslinking for spatial control in the gel state. Postprinting thermal treatment transforms the crosslinked precursor polymer to PMDA-ODA. The dimensional shrinkage is isotropic, and postprocessing preserves geometric integrity. Furthermore, large-area mask-projection scanning stereolithography demonstrates the scalability of 3D structures. These unique high-performance 3D structures offer potential in fields ranging from water filtration and gas separation to automotive and aerospace technologies. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  4. Terahertz coded aperture mask using vanadium dioxide bowtie antenna array

    Science.gov (United States)

    Nadri, Souheil; Percy, Rebecca; Kittiwatanakul, Lin; Arsenovic, Alex; Lu, Jiwei; Wolf, Stu; Weikle, Robert M.

    2014-09-01

    Terahertz imaging systems have received substantial attention from the scientific community for their use in astronomy, spectroscopy, plasma diagnostics and security. One approach to designing such systems is to use focal plane arrays. Although the principle of these systems is straightforward, realizing practical architectures has proven deceptively difficult. A different approach to imaging consists of spatially encoding the incoming flux of electromagnetic energy prior to detection using a reconfigurable mask. This technique is referred to as "coded aperture" or "Hadamard" imaging. This paper details the design, fabrication and testing of a prototype coded aperture mask operating at WR-1.5 (500-750 GHz) that uses the switching properties of vanadium dioxide(VO2). The reconfigurable mask consists of bowtie antennas with vanadium dioxide VO2 elements at the feed points. From the symmetry, a unit cell of the array can be represented by an equivalent waveguide whose dimensions limit the maximum operating frequency. In this design, the cutoff frequency of the unit cell is 640 GHz. The VO2 devices are grown using reactive-biased target ion beam deposition. A reflection coefficient (S11) measurement of the mask in the WR-1.5 (500-750 GHz) band is conducted. The results are compared with circuit models and found to be in good agreement. A simulation of the transmission response of the mask is conducted and shows a transmission modulation of up to 28 dB. This project is a first step towards the development of a full coded aperture imaging system operating at WR-1.5 with VO2 as the mask switching element.

  5. Serotonin dependent masking of hippocampal sharp wave ripples.

    Science.gov (United States)

    ul Haq, Rizwan; Anderson, Marlene L; Hollnagel, Jan-Oliver; Worschech, Franziska; Sherkheli, Muhammad Azahr; Behrens, Christoph J; Heinemann, Uwe

    2016-02-01

    Sharp wave ripples (SPW-Rs) are thought to play an important role in memory consolidation. By rapid replay of previously stored information during slow wave sleep and consummatory behavior, they result from the formation of neural ensembles during a learning period. Serotonin (5-HT), suggested to be able to modify SPW-Rs, can affect many neurons simultaneously by volume transmission and alter network functions in an orchestrated fashion. In acute slices from dorsal hippocampus, SPW-Rs can be induced by repeated high frequency stimulation that induces long-lasting LTP. We used this model to study SPW-R appearance and modulation by 5-HT. Although stimulation in presence of 5-HT permitted LTP induction, SPW-Rs were "masked"--but appeared after 5-HT wash-out. This SPW-R masking was dose dependent with 100 nM 5-HT being sufficient--if the 5-HT re-uptake inhibitor citalopram was present. Fenfluramine, a serotonin releaser, could also mask SPW-Rs. Masking was due to 5-HT1A and 5-HT2A/C receptor activation. Neither membrane potential nor membrane conductance changes in pyramidal cells caused SPW-R blockade since both remained unaffected by combining 5-HT and citalopram. Moreover, 10 and 30 μM 5-HT mediated SPW-R masking preceded neuronal hyperpolarization and involved reduced presynaptic transmitter release. 5-HT, as well as a 5-HT1A agonist, augmented paired pulse facilitation and affected the coefficient of variance. Spontaneous SPW-Rs in mice hippocampal slices were also masked by 5-HT and fenfluramine. While neuronal ensembles can acquire long lasting LTP during higher 5-HT levels, lower 5-HT levels enable neural ensembles to replay previously stored information and thereby permit memory consolidation memory.

  6. Shadow mask assisted heteroepitaxy of compound semiconductor nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Schallenberg, T.

    2004-07-01

    Shadow Mask assisted Molecular Beam Epitaxy (SMMBE) is a technique enabling selected area epitaxy of semiconductor heterostructures through shadow masks. The objective of this work was the development of the SMMBE technique for the reliable fabrication of compound semiconductor nanostructures of high structural and optical quality. In order to accomplish this, technological processes have been developed and optimized. One of the technological developments to this effect, which has substantially enhanced the versatility of SMMBE, is the introduction of a new type of freestanding shadow masks. A consistent model has been developed, which successfully explains the growth dynamics of molecular beam epitaxy through shadow masks. The predictions of the model regarding the growth of II-VI and III-V compounds have been tested experimentally and the dependence of the growth rates on the growth parameters has been verified. Moreover, it has been shown, that selected area epitaxy of II-VI and III-V compounds are governed by different surface kinetics. In addition to the basic surface kinetic processes described by the model, the roles of orientation and strain-dependent growth dynamics, partial shadow, and material deposition on the mask (closure of apertures) have been discussed. The resulting advanced understanding of the growth dynamics (model and basic experiments) in combination with the implementation of technical improvements has enabled the development and application of a number of different processes for the fabrication of both II-VI and III-V nanostructures. In addition to specific material properties, various other phenomena have been exploited, e.g., self-organization. Bright cathodoluminescence demonstrates that the resulting quantum structures are of high structural and optical quality. In addition to these results the limitations of the method have also been discussed, and various approaches to overcome them have been suggested. Moreover, propositions for the

  7. Towards reduced impact of EUV mask defectivity on wafer

    Science.gov (United States)

    Jonckheere, R.; Van den Heuvel, D.; Pacco, A.; Pollentier, I.; Baudemprez, B.; Jehoul, C.; Hermans, J.; Hendrickx, E.

    2014-07-01

    The defectivity challenges of extreme ultraviolet (EUV) masks, that need to be addressed before production readiness of EUV lithography is assured from the mask perspective, are twofold. First, the EUV-specific defect type relating to the multi-layer (ML) mirror, the so-called ML-defects, require to become more detectable than they are printable. This not only requires proven capability of blank inspection, but also the existence of satisfactory printability mitigation strategies (comprising avoidance, pattern shift methodology, compensation repair). Both these assets need to become available within the mask supply chain, as there is little that can still be done about such residual defects at the wafer fab. In a production phase, finding unexpected printing ML-defects is unacceptable. It is shown how the specific way-of-working in use at imec, starting from the printed wafer, contributes to related learning and identification of remaining gaps, in getting this issue fully dealt with. The second challenge relates to particle contamination during use of the reticle at the wafer fab. Avoiding overlaycritical particles on the backside of NXE3100 reticles is facilitated by the established way-of-working. Minimizing the occurrence of particles "hopping" between reticles via the electrostatic clamp of the scanner (so-called clamp-traveling particles) is a major driver for appropriate mask cleaning. The latter may not have negative impact by frequent use, in view of the highly vulnerable EUV mask stack, and especially for the present "black-border" solution in which the ML is etched away at the image border on the reticle. A lot of effort is spent into monitoring of NXE3100 reticles for particle adders on the pattern side. This is realized by comparing past and present mask defect maps obtained by inspection of printed wafers with subsequent repeater analysis.

  8. Influence of binary mask estimation errors on robust speaker identification

    DEFF Research Database (Denmark)

    May, Tobias

    2017-01-01

    Missing-data strategies have been developed to improve the noise-robustness of automatic speech recognition systems in adverse acoustic conditions. This is achieved by classifying time-frequency (T-F) units into reliable and unreliable components, as indicated by a so-called binary mask. Different...... approaches have been proposed to handle unreliable feature components, each with distinct advantages. The direct masking (DM) approach attenuates unreliable T-F units in the spectral domain, which allows the extraction of conventionally used mel-frequency cepstral coefficients (MFCCs). Instead of attenuating...

  9. Scenes of shame, social Roles, and the play with masks

    DEFF Research Database (Denmark)

    Welz, Claudia

    2014-01-01

    more ambiguous, dynamic self-image as result of an interactive evaluation of oneself by oneself and others. Seeing oneself seen contributes to the sense of who one becomes. From being absorbed in what one does, one might suddenly become self-aware, shift viewpoints and feel pressed to put on masks....... In putting on a mask, one relates to oneself in distancing oneself from oneself. In being at once a moral agent and a performing actor with an audience and norms in mind, one embodies and transcends the social roles one takes. In addition to the feeling of shame, in which the self finds itself passively...

  10. LER control and mitigation: mask roughness induced LER

    Energy Technology Data Exchange (ETDEWEB)

    McClinton, Brittany; Naulleau, Patrick

    2011-02-21

    In the push towards commercialization of extreme-ultraviolet lithography (EUVL), meeting the stringent requirements for line-edge roughness (LER) is increasingly challenging. For the 22-nm half-pitch node and below, the ITRS requires under 1.2 nm LER. Much of this LER is thought to arise from three significant contributors: LER on the mask absorber pattern, LER from the resist, and LER from mask roughness induced speckle. The physical mechanism behind the last contributor is becoming clearer, but how it is affected by the presence of aberrations is less well understood. Here, we conduct a full 2D aerial image simulation analysis of aberrations sensitivities of mask roughness induced LER for the first 37 fringe zernikes. These results serve as a guideline for future LER aberrations control. In examining how to mitigate mask roughness induced LER, we next consider an alternate illumination scheme whereby a traditional dipole's angular spectrum is extended in the direction parallel to the line-and-space mask absorber pattern to represent a 'strip'. While this illumination surprisingly provides merely minimal improvement to the LER as several alternate illumination schemes, overall imaging quality in terms of ILS, NILS, and contrast is improved. While the 22-nm half-pitch node can tolerate significant aberrations from a mask roughness induced LER perspective, total aberration levels for the 16-nm half-pitch node need to be strictly capped at 0.25nm rms to meet the ITRS guidelines. An individual aberrations study for the first 37 fringe zernikes on the 16-nm half-pitch node at the 0.25nm rms level reveals a sensitivity to various forms of spherical aberrations (Z9 & Z25) and quadrafoil (Z28) in particular, under conventional crosspole illumination ({sigma} = 0.10). Compared to conventional dipole or crosspole illuminations, an extended dipole 'strip' illumination scheme offers a way to mitigate mask roughness induced LER, while still maintaining

  11. TASTE MASKING METHODS AND AGENTS IN PHARMACEUTICAL FORMULATIONS

    Directory of Open Access Journals (Sweden)

    Mirajkar Reshma Nilesh

    2012-08-01

    Full Text Available Taste is a critical factor during development of any dosage form and it is important parameter in administering drugs orally. Undesirable and particularly bitter taste is one of the important formulation problems that are encountered with many drugs. Proven methods for bitterness reduction and inhibition have resulted in improved palatability of oral pharmaceuticals. The present review explains in detail the various methods and agents used for taste-masking like, Inclusion complexation, Ion exchange resin, Coating, Granulation, Microencapsulation, Flavors, and Sweeteners, Pro-drug etc.The review also highlights factors affecting the selection of technology for taste masking and methods for evaluation of taste.

  12. Mask synthesis and verification based on geometric model for surface micro-machined MEMS

    Institute of Scientific and Technical Information of China (English)

    LI Jian-hua; LIU Yu-sheng; GAO Shu-ming

    2005-01-01

    Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.

  13. The time-course of visual masking effects on saccadic responses indicates that masking interferes with reentrant processing

    DEFF Research Database (Denmark)

    Crouzet, S.; Pin, Simon Hviid Del; Overgaard, Morten

    2013-01-01

    Object substitution masking (OSM) occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. Here, we tested the widespread assumption that OSM selectively impairs reentrant processing. If OSM interferes selectively...... with reentrant processing, then the first feedforward sweep should be left relatively intact. Using a standard OSM paradigm in combination with a saccadic choice task, giving access to an early phase of visual processing (the fastest saccades occurring only 100 ms after target onset), we compared the masking....... Interestingly, the same result was observed using backward masking. In a follow-up experiment, where we assessed observer’s visual awareness using single-trial visibility ratings, we demonstrated that these ultra-fast responses were actually linked to subsequent reported visibility. Taken together...

  14. Actinic Mask Inspection at the ALS Initial Design Review

    Energy Technology Data Exchange (ETDEWEB)

    Barty, A; Chapman, H; Sweeney, D; Levesque, R; Bokor, J; Gullikson, E; Jong, S; Liu, Y; Yi, M; Denbeaux, G; Goldberg, K; Naulleau, P; Denham, P; Rekawa, S; Baston, P; Tackaberry, R; Barale, P

    2003-03-05

    This report is the first milestone report for the actinic mask blank inspection project conducted at the VNL, which forms sub-section 3 of the Q1 2003 mask blank technology transfer program at the VNL. Specifically this report addresses deliverable 3.1.1--design review and preliminary tool design. The goal of this project is to design an actinic mask inspection tool capable of operating in two modes: high-speed scanning for the detection of multilayer defects (inspection mode), and a high-resolution aerial image mode in which the image emulates the imaging illumination conditions of a stepper system (aerial image or AIM mode). The purpose and objective of these two modes is as follows: (1) Defect inspection mode--This imaging mode is designed to scan large areas of the mask for defects EUV multilayer coatings. The goal is to detect the presence of multilayer defects on a mask blank and to store the co-ordinates for subsequent review in AIM mode, thus it is not essential that the illumination and imaging conditions match that of a production stepper. Potential uses for this imaging mode include: (a) Correlating the results obtained using actinic inspection with results obtained using other non-EUV defect inspection systems to verify that the non-EUV scanning systems are detecting all critical defects; (b) Gaining sufficient information to associate defects with particular processes, such as various stages of the multilayer deposition or different modes of operation of the deposition tool; and (c) Assessing the density and EUV impact of surface and multilayer anomalies. Because of the low defect density achieved using current multilayer coating technology it is necessary to be able to efficiently scan large areas of the mask in order to obtain sufficient statistics for use in cross-correlation experiments. Speed of operation as well as sensitivity is therefore key to operation in defect inspection mode. (2) Aerial Image Microscope (AIM) mode--In AIM mode the tool is

  15. 3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

    Science.gov (United States)

    Saied, Mazen; Foussadier, Franck; Belledent, Jérôme; Trouiller, Yorick; Schanen, Isabelle; Yesilada, Emek; Gardin, Christian; Urbani, Jean Christophe; Sundermann, Frank; Robert, Frédéric; Couderc, Christophe; Vautrin, Florent; LeCam, Laurent; Kerrien, Gurwan; Planchot, Jonathan; Martinelli, Catherine; Wilkinson, Bill; Rody, Yves; Borjon, Amandine; Morgana, Nicolo; Di-Maria, Jean-Luc; Farys, Vincent

    2007-10-01

    The perpetual shrinking in critical dimensions in semiconductor devices is driving the need for increased resolution in optical lithography. Increasing NA to gain resolution also increases Optical Proximity Correction (OPC) model complexity. Some optical effects which have been completely neglected in OPC modeling become important. Over the past few years, off-axis illumination has been widely used to improve the imaging process. OPC models which utilize such illumination still use the thin film mask approximation (Kirchhoff approach), during optical model generation, which utilizes a normal incidence. However, simulating a three dimensional mask near-field using an off-axis illumination requires OPC models to introduce oblique incidence. In addition, the use of higher NA systems introduces high obliquity field components that can no longer be assimilated as normal incident waves. The introduction of oblique incidence requires other effects, such as corner rounding of mask features, to be considered, that are seldom taken into account in OPC modeling. In this paper, the effects of oblique incidence and corner rounding of mask features on resist contours of 2D structures (i.e. line-ends and corners) are studied. Rigorous electromagnetic simulations are performed to investigate the scattering properties of various lithographic 32nm node mask structures. Simulations are conducted using a three dimensional phase shift mask topology and an off-axis illumination at high NA. Aerial images are calculated and compared with those obtained from a classical normal incidence illumination. The benefits of using an oblique incidence to improve hot-spot prediction will be discussed.

  16. A simple method of fabricating mask-free microfluidic devices for biological analysis.

    KAUST Repository

    Yi, Xin

    2010-09-07

    We report a simple, low-cost, rapid, and mask-free method to fabricate two-dimensional (2D) and three-dimensional (3D) microfluidic chip for biological analysis researches. In this fabrication process, a laser system is used to cut through paper to form intricate patterns and differently configured channels for specific purposes. Bonded with cyanoacrylate-based resin, the prepared paper sheet is sandwiched between glass slides (hydrophilic) or polymer-based plates (hydrophobic) to obtain a multilayer structure. In order to examine the chip\\'s biocompatibility and applicability, protein concentration was measured while DNA capillary electrophoresis was carried out, and both of them show positive results. With the utilization of direct laser cutting and one-step gas-sacrificing techniques, the whole fabrication processes for complicated 2D and 3D microfluidic devices are shorten into several minutes which make it a good alternative of poly(dimethylsiloxane) microfluidic chips used in biological analysis researches.

  17. Patterned graphene functionalization via mask-free scanning of micro-plasma jet under ambient condition

    Energy Technology Data Exchange (ETDEWEB)

    Ye, Dong; Yu, Yao, E-mail: ensiyu@mail.hust.edu.cn; Liu, Lin [School of Materials Science and Engineering, Huazhong University of Science and Technology, 430074 Wuhan (China); Wu, Shu-Qun; Lu, Xin-Pei [State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, 430074 Wuhan (China); Wu, Yue [Department of Physics and Astronomy, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3255 (United States)

    2014-03-10

    In this work, a mask-free method is introduced for patterned nitrogen doping of graphene using a micro-plasma jet under ambient condition. Raman and X-ray photoelectron spectroscopy spectra indicate that nitrogen atoms are incorporated into the graphene lattice with the two-dimensional spatial distribution precisely controlled in the range of mm down to 10 μm. Since the chemistry of the micro-plasma jet can be controlled by the choice of the gas mixture, this direct writing process with micro-plasma jet can be a versatile approach for patterned functionalization of graphene with high spatial resolution. This could have promising applications in graphene-based electronics.

  18. Gas turbine

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Ok Ryong

    2004-01-15

    This book introduces gas turbine cycle explaining general thing of gas turbine, full gas turbine cycle, Ericson cycle and Brayton cycle, practical gas turbine cycle without pressure loss, multiaxial type gas turbine cycle and special gas turbine cycle, application of basic theory on a study on suction-cooling gas turbine cycle with turbo-refrigerating machine using the bleed air, and general performance characteristics of the suction-cooling gas turbine cycle combined with absorption-type refrigerating machine.

  19. Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM

    Science.gov (United States)

    Yamana, Mitsuharu; Lamantia, Matthew; Philipsen, Vicky; Wada, Shingo; Nagatomo, Tatsuya; Tonooka, Yoji

    2009-04-01

    The mask error budget continues to shrink with shrinking DRAM half pitch and MPU gate size year by year. The ITRS roadmap calls for mask CDU to be cut in half by 2014[1]. Both mask maker and mask user must take advantage of various mask properties, OPC strategies and resolution enhancement techniques to drive improvements. Mask material selection impacts both lithographic performance and mask manufacturability. In turn mask material properties and manufacturing techniques impact our ability to meet the technology roadmap. Studies have shown the advantages of polarized light[2,3] as well as the impact of various mask materials on high NA lithography[4]. In this paper we select the recently introduced binary mask material made from a MoSi absorber called Opaque MoSi On Glass (OMOG) for comparison with the conventional 6% att. PSM and 20% att. MoSi PSM. Through simulation and wafer prints, we optimized mask feature from viewpoint of MEEF and maximum exposure latitude (EL). The MoSi att. PSMs suffer from higher MEEF, which is attributed to the negative effect of TE polarization for mask duty cycle of 50% for 50 nm half pitch and below. Therefore a lower mask duty cycle is required for att. PSM to bring the MEEF performance back to acceptable levels. Experimental results confirm simulation results. As a result of the lower mask duty cycle, the att. MoSi PSMs exhibit poor Sub Resolution Assist Feature (SRAF) printability. On the contrary, the MoSi binary mask delivers both acceptable MEEF and acceptable SRAF printing performance. Moreover, we found that the mask structure impact of OMOG to wafer CD is smallest among three masks. OMOG gives the best combination of lithographic performance and delivery compared to the MoSi att. PSMs.

  20. Experimental demonstration of binary shaped pupil mask coronagraphs for telescopes with obscured pupils

    CERN Document Server

    Haze, Kanae; Abe, Lyu; Takahashi, Aoi; Kotani, Takayuki; Yamamuro, Tomoyasu

    2016-01-01

    We present the fabrication and experimental demonstration of three free-standing binary shaped pupil mask coronagraphs, which are applicable for telescopes with partially obscured pupils. Three masks, designed to be complementary (labeled Mask-A, Mask-B, and Mask-C), were formed in 5 micron thick nickel. The design of Mask-A is based on a one-dimensional barcode mask. The design principle of Mask-B is similar, but has a smaller inner working angle and a lower contrast than Mask-A. Mask-C is based on a concentric ring mask and provides the widest dark region and a symmetric point spread function. Mask-A and Mask-C were both designed to produce a flexibly tailored dark region (i.e., non-uniform contrast). The contrast was evaluated using a light source comprising a broadband super-luminescent light-emitting diode with a center wavelength of 650 nm, and the measurements were carried out in a large vacuum chamber. Active wavefront control was not applied in this work. The coronagraphic images obtained by experime...

  1. Challenges and technical requirements for multi-beam mask writer development

    Science.gov (United States)

    Lee, Sang Hee; Choi, Jin; Lee, Ho June; Shin, In Kyun; Tamamushi, Shuichi; Jeon, Chan-Uk

    2014-07-01

    Because mask patterning quality of CD uniformity, MTT, registration and smaller assist feature size is important for wafer patterning, the higher exposure dose and complex pattern design will be necessary. It is the reason why the faster and more accurate e-beam mask writer is needed for future design node. Multi-beam mask writer is the most promising new e-beam mask writer technology for future sub-10nm device mask patterning to solve the pattern quality issue and writing time problem. In this report, the technical challenges of multi-beam mask writer are discussed by comparison with problems of current VSB e-beam mask writer. Comparing with e-beam mask writer which has the critical issues of beam size and position control, the application of entirely different methods and techniques of CD and position control is essential for multi-beam mask writer which has new architecture and writing strategy. Using the simulation method, we present the different challenges between VSB and multi-beam mask writer. And there are many important technical requirements to achieve expected specification of multi-beam mask writer. To understand such requirements, the patterning simulation and mathematical calculation are done for analysis. Based on the patterning simulation, the detail technical requirements and issues of multi-beam mask writer are achieved. Consequently, we suggest the direction of multi-beam mask writer development in terms of technical challenges and requirements.

  2. Development of a new high transmission phase shift mask technology for 10 nm logic node

    Science.gov (United States)

    Faure, Thomas; Sakamoto, Yoshifumi; Toda, Yusuke; Badger, Karen; Seki, Kazunori; Lawliss, Mark; Isogawa, Takeshi; Zweber, Amy; Kagawa, Masayuki; Wistrom, Richard; Xu, Yongan; Lobb, Granger; Viswanathan, Ramya; Hu, Lin; Inazuki, Yukio; Nishikawa, Kazuhiro

    2016-05-01

    In this paper we will describe the development of a new 12% high transmission phase shift mask technology for use with the 10 nm logic node. The primary motivation for this work was to improve the lithographic process window for 10 nm node via hole patterning by reducing the MEEF and improving the depth of focus (DOF). First, the simulated MEEF and DOF data will be compared between the 6% and high T PSM masks with the transmission of high T mask blank varying from 12% to 20%. This resulted in selection of a 12% transmission phase shift mask. As part of this work a new 12% attenuated phase shift mask blank was developed. A detailed description and results of the key performance metrics of the new mask blank including radiation durability, dry etch properties, film thickness, defect repair, and defect inspection will be shared. In addition, typical mask critical dimension uniformity and mask minimum feature size performance for 10 nm logic node via level mask patterns will be shown. Furthermore, the results of work to optimize the chrome hard mask film properties to meet the final mask minimum feature size requirements will be shared. Lastly, the key results of detailed lithographic performance comparisons of the process of record 6% and new 12% phase shift masks on wafer will be described. The 12% High T blank shows significantly better MEEF and larger DOF than those of 6% PSM mask blank, which is consistent with our simulation data.

  3. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, Sietske; Kroesbergen, Evelyn; Slot, Esther; de Bree, Elise

    2014-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia

  4. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, S.; Kroesbergen, E.H.; Slot, E.M.; de Bree, E.H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia

  5. Masked Translation Priming with Semantic Categorization: Testing the Sense Model

    Science.gov (United States)

    Wang, Xin; Forster, Kenneth I.

    2010-01-01

    Four experiments are reported which were designed to test hypotheses concerning the asymmetry of masked translation priming. Experiment 1 confirmed the presence of L2-L1 priming with a semantic categorization task and demonstrated that this effect was restricted to exemplars. Experiment 2 showed that the translation priming effect was not due to…

  6. Auditory Backward Masking Deficits in Children with Reading Disabilities

    Science.gov (United States)

    Montgomery, Christine R.; Morris, Robin D.; Sevcik, Rose A.; Clarkson, Marsha G.

    2005-01-01

    Studies evaluating temporal auditory processing among individuals with reading and other language deficits have yielded inconsistent findings due to methodological problems (Studdert-Kennedy & Mody, 1995) and sample differences. In the current study, seven auditory masking thresholds were measured in fifty-two 7- to 10-year-old children (26…

  7. Masked Translation Priming with Semantic Categorization: Testing the Sense Model

    Science.gov (United States)

    Wang, Xin; Forster, Kenneth I.

    2010-01-01

    Four experiments are reported which were designed to test hypotheses concerning the asymmetry of masked translation priming. Experiment 1 confirmed the presence of L2-L1 priming with a semantic categorization task and demonstrated that this effect was restricted to exemplars. Experiment 2 showed that the translation priming effect was not due to…

  8. Inverse Target- and Cue-Priming Effects of Masked Stimuli

    Science.gov (United States)

    Mattler, Uwe

    2007-01-01

    The processing of a visual target that follows a briefly presented prime stimulus can be facilitated if prime and target stimuli are similar. In contrast to these positive priming effects, inverse priming effects (or negative compatibility effects) have been found when a mask follows prime stimuli before the target stimulus is presented: Responses…

  9. High Reading Skills Mask Dyslexia in Gifted Children

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H.; Slot, Esther M.; de Bree, Elise H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with…

  10. "Kuldne mask" - hea vene teater Eestis / Laur Kaunissaare

    Index Scriptorium Estoniae

    Kaunissaare, Laur, 1982-

    2009-01-01

    6.-13. okt. Tallinnas ja Jõhvis toimuvast Venemaa rahvuslikust teatrifestivalist "Kuldne mask Eestis". Festivali lavastustest - Temur Tšheidze "Onukese unenägu", Declan Donnellan "Kaheteistkümnes öö", Lev Erenburgi "Äike" ja Alvis Hermanise "Šukšini jutustused"

  11. Modeling comodulation masking release using an equalization cancellation mechanism

    DEFF Research Database (Denmark)

    Piechowiak, Tobias; Ewert, Stephan; Dau, Torsten

    of the study investigates the relation between CMR and envelope-based binaural masking level differences (BMLD), using narrowband noise maskers and classical across-channel configurations (like N0Spi, N0Sm). In the second part, a model is presented that explicitly simulates CMR whereby the EC mechanism...

  12. Lateral masking effects on contrast sensitivity in rats.

    Science.gov (United States)

    Kurylo, Daniel D; Yeturo, Sowmya; Lanza, Joseph; Bukhari, Farhan

    2017-09-29

    Changes in target visibility may be produced by additional stimulus elements at adjacent locations. Such contextual effects may reflect lateral interactions of stimulus representations in early cortical areas. It has been reported that the organization of orientation preference found in primates and cats visual cortex differs from that found in rodents, suggesting functional distinctions across species. In order to examine effects of lateral interactions at a perceptual level, contrast sensitivity in rats was measured for Gabor patches masked by two additional patches. Rats responded to target onset, and perceptual indices were based upon reaction time distributions across levels of luminance contrast. It was found that contrast sensitivity of targets without lateral masks corresponded to levels previously reported. For all measurements, the presence of sustained lateral masks systematically reduced sensitivity to targets, demonstrating interference by adjacent elements across levels of contrast. Effects of mask orientation or separation were not observed. These results may reflect reported non-systematic topography of orientation tuning across the cortex in rodents. Results suggest that intrinsic lateral connections in early processing areas play a minimal role in stimulus integration for rats. Copyright © 2017 Elsevier B.V. All rights reserved.

  13. Evidence for Early Morphological Decomposition: Combining Masked Priming with Magnetoencephalography

    Science.gov (United States)

    Lehtonen, Minna; Monahan, Philip J.; Poeppel, David

    2011-01-01

    Are words stored as morphologically structured representations? If so, when during word recognition are morphological pieces accessed? Recent masked priming studies support models that assume early decomposition of (potentially) morphologically complex words. The electrophysiological evidence, however, is inconsistent. We combined masked…

  14. General Projective Synchronization and Fractional Order Chaotic Masking Scheme

    Institute of Scientific and Technical Information of China (English)

    Shi-Quan Shao

    2008-01-01

    In this paper, a fractional order chaoticmasking scheme used for secure communication isintroduced. Based on the general projectivesynchronization of two coupled fractional Chen systems,a popular masking scheme is designed. Numericalexample is given to demonstrate the effectiveness of theproposed method.

  15. Combining energetic and informational masking for speech identification

    Science.gov (United States)

    Kidd, Gerald; Mason, Christine R.; Gallun, Frederick J.

    2005-08-01

    This study examined combinations of energetic and informational maskers in speech identification. Speech targets and maskers (speech or noise) were processed and filtered into sets of 15 narrow frequency bands. The target was the sum of eight randomly selected bands. More masking occurred for speech maskers than for spectrally matched noise maskers regardless of whether the masker bands overlapped the target bands. The greater effect of the speech maskers was interpreted as due to informational masking. When the masker was comprised of nonoverlapping bands of speech, the addition of bands of noise overlapping the speech masker, but not the speech target, reduced the overall amount of masking. Surprisingly, presenting the noise to the ear contralateral to the target and masker produced an even greater release from masking. The contralateral noise was apparently sufficient to cause a slight change in the image of the ipsilateral speech masker, possibly pulling it away from the target enough to allow the focus of attention on the target. This finding is consistent with the interpretation that in some conditions small binaural differences may be sufficient to cause, or significantly strengthen, the perceptual segregation of sounds.

  16. Prone surgery and laryngeal mask airways: an overview of recent ...

    African Journals Online (AJOL)

    2013-08-17

    Aug 17, 2013 ... muscular blocking drugs with their own risks and side- ... Clinicians tend to avoid the use of a laryngeal mask airway (LMA) in ... Patients are more haemodynamically stable if induced in the prone position .... be more pertinent in male patients.4 ... average body mass index (BMI) was 30.6 kg/m2 for females.

  17. Multi-shaped e-beam technology for mask writing

    Science.gov (United States)

    Gramss, Juergen; Stoeckel, Arnd; Weidenmueller, Ulf; Doering, Hans-Joachim; Bloecker, Martin; Sczyrba, Martin; Finken, Michael; Wandel, Timo; Melzer, Detlef

    2010-09-01

    Photomask lithography for the 22nm technology node and beyond requires new approaches in equipment as well as mask design. Multi Shaped Beam technology (MSB) for photomask patterning using a matrix of small beamlets instead of just one shaped beam, is a very effective and evolutionary enhancement of the well established Variable Shaped Beam (VSB) technique. Its technical feasibility has been successfully demonstrated [2]. One advantage of MSB is the productivity gain over VSB with decreasing critical dimensions (CDs) and increasing levels of optical proximity correction (OPC) or for inverse lithography technology (ILT) and source mask optimization (SMO) solutions. This makes MSB an attractive alternative to VSB for photomask lithography at future technology nodes. The present paper describes in detail the working principles and advantages of MSB over VSB for photomask applications. MSB integrates the electron optical column, x/y stage and data path into an operational electron beam lithography system. Multi e-beam mask writer specific requirements concerning the computational lithography and their implementation are outlined here. Data preparation of aggressive OPC layouts, shot count reductions over VSB, data path architecture, write time simulation and several aspects of the exposure process sequence are also discussed. Analysis results of both the MSB processing and the write time of full 32nm and 22nm node critical layer mask layouts are presented as an example.

  18. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, S.; Kroesbergen, E.H.; Slot, E.M.; de Bree, E.H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with

  19. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, Sietske; Kroesbergen, Evelyn; Slot, Esther; de Bree, Elise

    2014-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with

  20. "Kuldne mask" - hea vene teater Eestis / Laur Kaunissaare

    Index Scriptorium Estoniae

    Kaunissaare, Laur, 1982-

    2009-01-01

    6.-13. okt. Tallinnas ja Jõhvis toimuvast Venemaa rahvuslikust teatrifestivalist "Kuldne mask Eestis". Festivali lavastustest - Temur Tšheidze "Onukese unenägu", Declan Donnellan "Kaheteistkümnes öö", Lev Erenburgi "Äike" ja Alvis Hermanise "Šukšini jutustused"

  1. Constructing optimized binary masks for reservoir computing with delay systems

    Science.gov (United States)

    Appeltant, Lennert; van der Sande, Guy; Danckaert, Jan; Fischer, Ingo

    2014-01-01

    Reservoir computing is a novel bio-inspired computing method, capable of solving complex tasks in a computationally efficient way. It has recently been successfully implemented using delayed feedback systems, allowing to reduce the hardware complexity of brain-inspired computers drastically. In this approach, the pre-processing procedure relies on the definition of a temporal mask which serves as a scaled time-mutiplexing of the input. Originally, random masks had been chosen, motivated by the random connectivity in reservoirs. This random generation can sometimes fail. Moreover, for hardware implementations random generation is not ideal due to its complexity and the requirement for trial and error. We outline a procedure to reliably construct an optimal mask pattern in terms of multipurpose performance, derived from the concept of maximum length sequences. Not only does this ensure the creation of the shortest possible mask that leads to maximum variability in the reservoir states for the given reservoir, it also allows for an interpretation of the statistical significance of the provided training samples for the task at hand.

  2. Modeling comodulation masking release using an equalization cancellation mechanism

    DEFF Research Database (Denmark)

    Piechowiak, Tobias; Ewert, Stephan; Dau, Torsten

    of the study investigates the relation between CMR and envelope-based binaural masking level differences (BMLD), using narrowband noise maskers and classical across-channel configurations (like N0Spi, N0Sm). In the second part, a model is presented that explicitly simulates CMR whereby the EC mechanism...

  3. Energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1996-01-01

    A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may...

  4. Matching profiles of masked perpetrators: a pilot study

    DEFF Research Database (Denmark)

    Lynnerup, Niels; Bojesen, Sophie; Kuhlman, Michael Bilde

    2010-01-01

    indicate the possible matches, and perhaps even the best match, which may be helpful in police investigations, but it would not carry enough weight to be used as evidence per se. This study only focused on the profile. Future studies will use surface laser scans to analyse congruence between masked...

  5. Optical synchrotron radiation beam imaging with a digital mask

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Hao [Univ. of Maryland, College Park, MD (United States); Fiorito, Ralph [Univ. of Maryland, College Park, MD (United States); Corbett, Jeff [SLAC National Accelerator Lab., Menlo Park, CA (United States); Shkvarunets, Anatoly [Univ. of Maryland, College Park, MD (United States); Tian, Kai [SLAC National Accelerator Lab., Menlo Park, CA (United States); Fisher, Alan [SLAC National Accelerator Lab., Menlo Park, CA (United States); Douglas, D. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Wilson, F. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Zhang, S. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Mok, W. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Mitsuhashi, T. [KEK, Tsukuba (Japan)

    2016-01-01

    The 3GeV SPEAR3 synchrotron light source operates in top-up injection mode with up to 500mA circulating in the storage ring (equivalently 392nC). Each injection pulse contains only 40-80 pC producing a contrast ratio between total stored charge and injected charge of about 6500:1. In order to study transient injected beam dynamics during User operations, it is desirable to optically image the injected pulse in the presence of the bright stored beam. In the present work this is done by re-imaging visible synchrotron radiation onto a digital micro-mirror-array device (DMD), which is then used as an optical mask to block out light from the bright central core of the stored beam. The physical masking, together with an asynchronously-gated, ICCD imaging camera makes it is possible to observe the weak injected beam component on a turn-by-turn basis. The DMD optical masking system works similar to a classical solar coronagraph but has some distinct practical advantages: i.e. rapid adaption to changes in the shape of the stored beam, high extinction ratio for unwanted light and minimum scattering from the primary beam into the secondary optics. In this paper we describe the DMD masking method, features of the high dynamic range point spread function for the SPEAR3 optical beam line and measurements of the injected beam in the presence of the stored beam.

  6. Prognostic importance of white coat and masked hypertention

    DEFF Research Database (Denmark)

    Gustavsen, Pia; Hansen, Tine

    2009-01-01

    The growing use of ambulatory blood pressure monitoring has led to an increased awareness of the two types of discrepancy between office blood pressure and ambulatory blood pressure, called white coat hypertension (WCH) and masked hypertension (MH). Based on several longitudinal studies, WCH...

  7. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.

    Science.gov (United States)

    Lee, Soo Jin; Jung, Chang Yong; Park, Sung Jin; Hwangbo, Chang Kweun; Seo, Hwan Seok; Kim, Sung Soo; Lee, Nae-Eung

    2012-04-01

    Among the core EUVL (extreme ultra-violet lithography) technologies for nanoscale patterning below the 30 nm node for Si chip manufacturing, new materials and fabrication processes for high-performance EUVL masks are of considerable importance due to the use of new reflective optics. In this work, the selective etching of SnO2 (tin oxide) as a new absorber material, with high EUV absorbance due to its large extinction coefficient, for the binary mask structure of SnO2 (absorber layer)/Ru (capping/etch stop layer)/Mo-Si multilayer (reflective layer)/Si (substrate), was investigated. Because infinitely high selectivity of the SnO2 layer to the Ru ESL is required due to the ultrathin nature of the Ru layer, various etch parameters were assessed in the inductively coupled Cl2/Ar plasmas in order to find the process window required for infinitely high etch selectivity of the SnO2 layer. The results showed that the gas flow ratio and V(dc) value play an important role in determining the process window for the infinitely high etch selectivity of SnO2 to Ru ESL. The high EUV-absorbance SnO2 layer, patternable by a dry process, allows a smaller absorber thickness, which can mitigate the geometric shadowing effects observed for high-performance binary EUVL masks.

  8. Mask characterization for CDU budget breakdown in advanced EUV lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  9. Past and future challenges from a display mask writer perspective

    Science.gov (United States)

    Ekberg, Peter; von Sydow, Axel

    2012-06-01

    Since its breakthrough, the liquid crystal technology has continued to gain momentum and the LCD is today the dominating display type used in desktop monitors, television sets, mobile phones as well as other mobile devices. To improve production efficiency and enable larger screen sizes, the LCD industry has step by step increased the size of the mother glass used in the LCD manufacturing process. Initially the mother glass was only around 0.1 m2 large, but with each generation the size has increased and with generation 10 the area reaches close to 10 m2. The increase in mother glass size has in turn led to an increase in the size of the photomasks used - currently the largest masks are around 1.6 × 1.8 meters. A key mask performance criterion is the absence of "mura" - small systematic errors captured only by the very sensitive human eye. To eliminate such systematic errors, special techniques have been developed by Micronic Mydata. Some mura suppressing techniques are described in this paper. Today, the race towards larger glass sizes has come to a halt and a new race - towards higher resolution and better image quality - is ongoing. The display mask is therefore going through a change that resembles what the semiconductor mask went through some time ago: OPC features are introduced, CD requirements are increasing sharply and multi tone masks (MTMs) are widely used. Supporting this development, Micronic Mydata has introduced a number of compensation methods in the writer, such as Z-correction, CD map and distortion control. In addition, Micronic Mydata MMS15000, the world's most precise large area metrology tool, has played an important role in improving mask placement quality and is briefly described in this paper. Furthermore, proposed specifications and system architecture concept for a new generation mask writers - able to fulfill future image quality requirements - is presented in this paper. This new system would use an AOD/AOM writing engine and be

  10. Actinic EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno B.; Kemp, Charles D.; Huh, S.; Han, H.-S.

    2008-08-06

    Operating at EUV wavelengths, the SEMATECH Berkeley Actinic Inspection Tool (AIT) is a zoneplate microscope that provides high quality aerial image measurements in routine operations for SEMATECH member companies. We have upgraded the optical performance of the AIT to provide multiple image magnifications, and several inspection NA values up to 0.35 NA equivalent (0.0875 mask-side). We report on the improved imaging capabilities including resolution below 100-nm on the mask side (25 nm, 4x wafer equivalent). EUV reticles are intricate optical systems made from of several materials with wavelength-specific optical properties. The combined interactions of the substrate, multilayer-stack, buffer layer and absorber layer produce a reflected EUV optical field that is challenging to model accurately, and difficult to fully assess without actinic at-wavelength inspection. Understanding the aerial image from lithographic printing alone is complicated by photoresist properties. The AIT is now used to investigate mask issues such as amplitude and phase defect printability, pattern repair techniques, contamination, inspection damage, and mask architecture. The AIT has a 6{sup o} illumination angle, and high-resolution exposure times are typically 20 seconds per image. The AIT operates semi-automatically capturing through-focus imaging series with step sizes as small as 0.1 {micro}m (0.5-0.8 {micro}m are typical), and a step resolution of 0.05 {micro}m. We believe it is the most advanced EUV mask inspection tool in operation today. In the AIT, an EUV image of the mask is projected by a zoneplate lens with high magnification (680-910x) onto a CCD camera. The CCD over-samples the image, providing equivalent pixel sizes down to 15 nm in mask coordinates-several image pixels per resolution element. The original AIT zoneplate specifications were designed to emulate the resolution of a 0.25-NA 4x stepper, and thorough benchmarking analysis of the aberrations, flare, contrast

  11. Optimization of mask shot count using MB-MDP and lithography simulation

    Science.gov (United States)

    Chua, Gek Soon; Wang, Wei Long; Choi, Byoung IL; Zou, Yi; Tabery, Cyrus; Bork, Ingo; Nguyen, Tam; Fujimura, Aki

    2011-11-01

    In order to maintain manageable process windows, mask shapes at the 20nm technology node and below become so complex that mask write times reach 40 hours or might not be writeable at all since the extrapolated write time reaches 80 hours. The recently introduced Model Based Mask Data Preparation (MB-MDP) technique is able to reduce shot count and therefore mask write time by using overlapping shots. Depending on the amount of shot count reduction the contour of the mask shapes is changed leading to the question how the mask contour influences wafer performance. This paper investigates the tradeoff between mask shot count reduction using MB-MDP and wafer performance using lithography simulation. A typical Source-Mask-Optimization (SMO) result for a 20nm technology will be used as an example.

  12. Simple solution for difficult face mask ventilation in children with orofacial clefts.

    Science.gov (United States)

    Veerabathula, Prardhana; Patil, Manajeet; Upputuri, Omkar; Durga, Padmaja

    2014-10-01

    Significant air leak from the facial cleft predisposes to difficult mask ventilation. The reported techniques of use of sterile gauze, larger face mask and laryngeal mask airway after intravenous induction have limited application in uncooperative children. We describe the use of dental impression material molded to the facial contour to cover the facial defect and aid ventilation with an appropriate size face mask in a child with a bilateral Tessier 3 anomaly.

  13. Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)

    Science.gov (United States)

    Harashima, Noriyuki; Iso, Hiroyuki; Chishima, Tatsuya

    2016-10-01

    6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed prototyping 9-inch size PSM KrF and ArF mask blanks. This time we will explain these PSM mask blanks status.

  14. Comparison of laryngeal mask airway use with endotracheal intubation during anesthesia of western lowland gorillas (Gorilla gorilla gorilla).

    Science.gov (United States)

    Cerveny, Shannon N; D'Agostino, Jennifer J; Davis, Michelle R; Payton, Mark E

    2012-12-01

    The laryngeal mask airway is an alternative to endotracheal intubation that achieves control of the airway by creating a seal around the larynx with an inflatable cuff. This study compared use of the laryngeal mask airway with endotracheal intubation in anesthetized western lowland gorillas (Gorilla gorilla gorilla). Eight adult gorillas were immobilized for routine and diagnostic purposes for a total of nine anesthetic events. During each anesthetic event, gorillas were either intubated (n = 4; group A) or fitted with a laryngeal mask airway (n= 5; group B). Time required to place each airway device, physiologic parameters, and arterial blood gas were measured and compared between the two groups. There were no significant differences between the two groups for time required to place airway device, heart rate, hemoglobin oxygen saturation, end-tidal carbon dioxide, arterial partial pressure of carbon dioxide, or arterial pH between the two groups. Mean arterial partial pressure of oxygen was significantly greater in group B, 15 (group A: 94 +/- 44 mm Hg; group B: 408 +/- 36 mm Hg; P= 0.0025) and 45 (group A: 104 +/- 21 mm Hg; group B: 407 +/- 77 mm Hg; P = 0.0026) min after airway device placement. Mean respiratory rate was significantly greater in group A at multiple time points. Mean arterial pressure (group A: 129 +/- 16 mm Hg; group B: 60 +/- 8 mm Hg) and diastolic blood pressure (group A: 115 +/- 21 mm Hg; group B: 36 +/- 10 mm Hg) were significantly greater in group A at the time of airway device placement. The laryngeal mask airway maintained oxygenation and ventilation effectively in all gorillas and is a useful alternative to endotracheal intubation in western lowland gorillas.

  15. 37 CFR 211.4 - Registration of claims of protection in mask works.

    Science.gov (United States)

    2010-07-01

    ... version of a mask work fixed in an intermediate or final form of any semiconductor chip product. However... registration per work, owners of mask works in final forms of semiconductor chip products that are produced by... commercially exploited: All original mask work elements fixed in a particular form of a semiconductor...

  16. Research on lithography based on the digital coding-mask technique

    Science.gov (United States)

    Xu, Yanqiang; Luo, Ningning; Zhang, Zhimin; Bai, Lu; Gao, Yiqing

    2016-10-01

    Digital coding-mask technique based on digital micro-mirror devices (DMD) is proposed in this paper. The fundamental rule of digital coding-mask technique is to modulate the incident light intensity by adjusting the transmittance of the units on the coding-mask. The transmittance is controlled by the apertures on the units of the coding-mask. Lohmann's III coding method and error diffusion coding method are employed to coding mask, and wavelet transformation is used to suppress the background noise of the mask image. Real-time control on the image of the digital coding mask can be realized by loading the coded mask image to DMD, which is driven by a computer. Digital coding-mask technique gives full play of the advantages of DMD, such as real time and flexibility. In addition, the digital coding-mask technique is helpful to deal with the problem of mask aberration, which is caused by the nonlinear effect in the process of projection and exposure. This technique can also make use of optimization algorithm to suppress the background noise of the digital coding-mask images so that the quality of the relief structure of photoresist is improved.

  17. Computational mask defect review for contamination and haze inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram; Wolf, Yulian; Shah, Pinkesh

    2013-09-01

    As optical lithography continues to extend into sub-0.35 k1 regime, mask defect inspection and subsequent review has become tremendously challenging, and indeed the largest component to mask manufacturing cost. The routine use of various resolution enhancement techniques (RET) have resulted in complex mask patterns, which together with the need to detect even smaller defects due to higher MEEFs, now requires an inspection engineer to use combination of inspection modes. This is achieved in 193nm AeraTM mask inspection systems wherein masks are not only inspected at their scanner equivalent aerial exposure conditions, but also at higher Numerical Aperture resolution, and special reflected-light, and single-die contamination modes, providing better coverage over all available patterns, and defect types. Once the required defects are detected by the inspection system, comprehensively reviewing and dispositioning each defect then becomes the Achilles heel of the overall mask inspection process. Traditionally, defects have been reviewed manually by an operator, which makes the process error-prone especially given the low-contrast in the convoluted aerial images. Such manual review also limits the quality and quantity of classifications in terms of the different types of characterization and number of defects that can practically be reviewed by a person. In some ways, such manual classification limits the capability of the inspection tool itself from being setup to detect smaller defects since it often results in many more defects that need to be then manually reviewed. Paper 8681-109 at SPIE Advanced Lithography 2013 discussed an innovative approach to actinic mask defect review using computational technology, and focused on Die-to-Die transmitted aerial and high-resolution inspections. In this approach, every defect is characterized in two different ways, viz., quantitatively in terms of its print impact on wafer, and qualitatively in terms of its nature and origin in

  18. Automatic classification and accurate size measurement of blank mask defects

    Science.gov (United States)

    Bhamidipati, Samir; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter

    2015-07-01

    A blank mask and its preparation stages, such as cleaning or resist coating, play an important role in the eventual yield obtained by using it. Blank mask defects' impact analysis directly depends on the amount of available information such as the number of defects observed, their accurate locations and sizes. Mask usability qualification at the start of the preparation process, is crudely based on number of defects. Similarly, defect information such as size is sought to estimate eventual defect printability on the wafer. Tracking of defect characteristics, specifically size and shape, across multiple stages, can further be indicative of process related information such as cleaning or coating process efficiencies. At the first level, inspection machines address the requirement of defect characterization by detecting and reporting relevant defect information. The analysis of this information though is still largely a manual process. With advancing technology nodes and reducing half-pitch sizes, a large number of defects are observed; and the detailed knowledge associated, make manual defect review process an arduous task, in addition to adding sensitivity to human errors. Cases where defect information reported by inspection machine is not sufficient, mask shops rely on other tools. Use of CDSEM tools is one such option. However, these additional steps translate into increased costs. Calibre NxDAT based MDPAutoClassify tool provides an automated software alternative to the manual defect review process. Working on defect images generated by inspection machines, the tool extracts and reports additional information such as defect location, useful for defect avoidance[4][5]; defect size, useful in estimating defect printability; and, defect nature e.g. particle, scratch, resist void, etc., useful for process monitoring. The tool makes use of smart and elaborate post-processing algorithms to achieve this. Their elaborateness is a consequence of the variety and

  19. Mask process matching using a model based data preparation solution

    Science.gov (United States)

    Dillon, Brian; Saib, Mohamed; Figueiro, Thiago; Petroni, Paolo; Progler, Chris; Schiavone, Patrick

    2015-10-01

    Process matching is the ability to precisely reproduce the signature of a given fabrication process while using a different one. A process signature is typically described as systematic CD variation driven by feature geometry as a function of feature size, local density or distance to neighboring structures. The interest of performing process matching is usually to address differences in the mask fabrication process without altering the signature of the mask, which is already validated by OPC models and already used in production. The need for such process matching typically arises from the expansion of the production capacity within the same or different mask fabrication facilities, from the introduction of new, perhaps more advanced, equipment to deliver same process of record masks and/or from the re-alignment of processes which have altered over time. For state-of-the-art logic and memory mask processes, such matching requirements can be well below 2nm and are expected to reduce below 1nm in near future. In this paper, a data preparation solution for process matching is presented and discussed. Instead of adapting the physical process itself, a calibrated model is used to modify the data to be exposed by the source process in order to induce the results to match the one obtained while running the target process. This strategy consists in using the differences among measurements from the source and target processes, in the calibration of a single differential model. In this approach, no information other than the metrology results is required from either process. Experimental results were obtained by matching two different processes at Photronics. The standard deviation between both processes was of 2.4nm. After applying the process matching technique, the average absolute difference between the processes was reduced to 1.0nm with a standard deviation of 1.3nm. The methods used to achieve the result will be described along with implementation considerations, to

  20. Pattern generation requirements for mask making beyond 130 nm

    Science.gov (United States)

    Abboud, Frank E.; Gesley, Mark A.; Maldonado, Juan R.

    1998-06-01

    It is commonly accepted in the semiconductor industry that optical lithography will be the most cost-effective solution for 150 nm and 130 nm device generations. Some selected layers at the 130 nm device generation may be produced using electron-beam direct-write or x-ray during the development phase. However, for the production phase, it is expected that 193 nm optical lithography with reticle enhancement techniques such as optical proximity correction (OPC) and phase shift masks (PSM) will be the technology of choice. What about post 193 nm. The range of solutions is more diverse and a clear winner has not yet emerged. The topic, however, is becoming more visible and has taken a prominent place in technical conferences in the past year. The five leading potential alternatives to optical lithography are proximity x-ray, e-beam projection (EBP), extended UV (EUV), ion projection lithography (IPL), and e-beam direct write. The search for the right answer will most likely continue for a few years, and possibly more than one alternative will emerge as an effective solution at and below 100 nm. All of the alternatives, with the exception of e-beam direct write, have one thing in common, the mask. Except for proximity x- ray, all solutions at present envision a 4x reduction of the mask-to-wafer image plane. Instead of chrome-coated quartz, a silicon wafer substrate is used. Aside from patterning, mask fabrication varies depending on the lithography absorbing substrate, and EUV requires a reflective multilayer stack. Most key lithography requirements needed to pattern the imaging layer are common to all of the candidates, at least for the reduction methods. For x-ray lithography, the requirements are significantly more stringent but at a smaller field. This paper will consolidate the requirements of the various types of masks from a pattern generation point of view and will focus on the pattern generation tool requirements to meet those mask requirements. In addition, it

  1. Fabless company mask technology approach: fabless but not fab-careless

    Science.gov (United States)

    Hisamura, Toshiyuki; Wu, Xin

    2009-10-01

    There are two different foundry-fabless working models in the aspect of mask. Some foundries have in-house mask facility while others contract with merchant mask vendors. Significant progress has been made in both kinds of situations. Xilinx as one of the pioneers of fabless semiconductor companies has been continually working very closely with both merchant mask vendors and mask facilities of foundries in past many years, contributed well in both technology development and benefited from corporations. Our involvement in manufacturing is driven by the following three elements: The first element is to understand the new fabrication and mask technologies and then find a suitable design / layout style to better utilize these new technologies and avoid potential risks. Because Xilinx has always been involved in early stage of advanced technology nodes, this early understanding and adoption is especially important. The second element is time to market. Reduction in mask and wafer manufacturing cycle-time can ensure faster time to market. The third element is quality. Commitment to quality is our highest priority for our customers. We have enough visibility on any manufacturing issues affecting the device functionality. Good correlation has consistently been observed between FPGA speed uniformity and the poly mask Critical Dimension (CD) uniformity performance. To achieve FPGA speed uniformity requirement, the manufacturing process as well as the mask and wafer CD uniformity has to be monitored. Xilinx works closely with the wafer foundries and mask suppliers to improve productivity and the yield from initial development stage of mask making operations. As an example, defect density reduction is one of the biggest challenges for mask supplier in development stage to meet the yield target satisfying the mask cost and mask turn-around-time (TAT) requirement. Historically, masks were considered to be defect free but at these advanced process nodes, that assumption no longer

  2. New type X—ray mask fabricated using inductvely coupled plasma deepetching

    Institute of Scientific and Technical Information of China (English)

    D.Chen; W.Lei; S.Wang; C.Li; X.Guo; H.Mao; D.Zhang; F.Yi

    2001-01-01

    The fabrication of X-ray masks is a critical and challenging process in LIGA technique.As inductively coupled plasma(ICP) deepetching appears to be the most suitable source for deep silicon etching,we fabricated a new type X-ray mask using this technique.In comparison with other types of X-ray masks,the mask we fabricated has the advantages of its low cost and its simple fabrication process.Besired microstructures have also been fabricated using this new type X-ray mask in LIGA technique.

  3. Technical validation of a face mask adapted for dry powder inhalation in the equine species.

    Science.gov (United States)

    Duvivier, D H; Votion, D; Vandenput, S; Art, T; Lekeux, P

    1997-11-01

    Development of dry powder inhalation (DPI) for horses requires the use of an adapted face mask. In experiment I, 4 masks (A, B, C and D) were tested and factors influencing the delivery of the dry powder were determined. Mask A was one which is commercially available for metered-dose inhalation. Mask B had the same shape as Mask A but an airtight rubber seal was added for the connection between the mask and horse's head. Mask C was a prototype adapted for DPI with connection for the DPI device between the nostrils, airtight expiratory valves in front of each nostril and airtight rubber seal to attach the mask on the horse's head. Mask D was the same as Mask C but the airtight expiratory valve was situated in front of one nostril and the connection for the DPI device was placed in front of the other nostril. Inhalet emptying and peak inspiratory pressure were measured on 5 healthy horses with each face mask. Both Masks A and B gave a low rate of inhalet emptying. Inspiratory pressures created in Masks C and D were negative enough to ensure inhalet emptying rates of mean +/- s.d. 98.28 +/- 1.79% and 100% respectively. In experiment 2, the face masks giving the greatest inhalet emptying were used to test the therapeutic efficacy of ipratropium bromide DPI. This was tested on 6 horses suffering from acute exacerbation of chronic obstructive pulmonary disease (COPD). At a dose of 200 micrograms/100 kg bwt, ipratropium administered with Mask D improved significantly pulmonary function measurements compared to baseline values and placebo inhalation. With Mask C, a double dose of ipratropium (400 micrograms/100 kg bwt) was necessary to improve these parameters compared to baseline values. This indicated the importance of locating the DPI device in front of one nostril. It was concluded that inhalet emptying is correlated to inspiratory pressures measured in the face masks. Secondly, these pressures are in turn dependent on the air-tightness of the mask, i.e. air

  4. Quality of patient positioning during cerebral tomotherapy irradiation using different mask systems.

    Science.gov (United States)

    Leitzen, C; Wilhelm-Buchstab, T; Garbe, S; Lütter, C; Müdder, T; Simon, B; Schild, H H; Schüller, H

    2014-04-01

    Patient immobilization during brain tumor radiotherapy is achieved by employing different mask systems. Two innovative mask systems were developed to minimize the problems of claustrophobic patients. Our aim was to evaluate whether the quality of patient immobilization using the new mask systems was equivalent to the standard mask system currently in use. Thirty-three patients with cerebral target volumes were irradiated using the Hi-Art II tomotherapy system between 2010 and 2012. Each group of 11 patients was fitted with one of the two new mask systems (Crystal® or Open Face® mask, Orfit) or the standard three-point mask (Raycast®-HP, Orfit) and a total of 557 radiotherapy fractions were evaluated. After positioning was checked by MV-CT, the necessary table adjustments were noted. Data were analyzed by comparing the groups, and safety margins were calculated for nonimage-guided irradiation. The mean values of the table adjustments were: (a) lateral (mm): - 0.22 (mask 1, standard deviation (σ): 2.15); 1.1 (mask 2, σ: 2.4); - 0.64 (mask 3, σ: 2.9); (b) longitudinal (mm): - 1 (mask 1, σ: 2.57); - 0.5 (mask 2, σ: 4.7); - 1.22 (mask 3, σ: 2.52); (c) vertical (mm): 0.62 (mask 1, σ: 0.63); 1.2 (mask 2, σ: 1.0); 0.57 (mask 3, σ: 0.28); (d) roll: 0.35° (mask 1, σ: 0.75); 0° (mask 2, σ: 0.8); 0.02° (mask 3, σ: 1.12). The outcomes suggest necessary safety margins of 5.49-7.38 mm (lateral), 5.4-6.56 mm (longitudinal), 0.82-3.9 mm (vertical), and 1.93-4.5° (roll). There were no significant differences between the groups. The new mask systems improve patient comfort while providing consistent patient positioning.

  5. Review of biomedical aspects of CB masks and their relationship to military performance. Technical report

    Energy Technology Data Exchange (ETDEWEB)

    Muza, S.R.

    1986-11-01

    This review describes the most important factors affecting military work performance while wearing a CB mask: (1) the additional inspiratory and expiratory breathing resistance; (2) increased external dead space; (3) thermal stress of the mask and hood; (4) restriction of functional vision; (5) hindrance of speech transmission and reception; (6) weight, size, and pressure on the face by the CB mask; (7) claustrophobic reactions, and (8) sleep loss and lack of nutrient intake due to long-term wear. In assessing the biomedical aspects of these factors, rather than making comparisons between specific models of CB masks, the review addresses these factors as they apply to CB masks in general.

  6. Imaging protoplanets: observing transition disks with non-redundant masking

    CERN Document Server

    Sallum, Steph; Close, Laird M; Hinz, Philip M; Follette, Katherine B; Kratter, Kaitlin; Skemer, Andrew J; Bailey, Vanessa P; Briguglio, Runa; Defrere, Denis; Macintosh, Bruce A; Males, Jared R; Morzinski, Katie M; Puglisi, Alfio T; Rodigas, Timothy J; Spalding, Eckhart; Tuthill, Peter G; Vaz, Amali; Weinberger, Alycia; Xomperio, Marco

    2016-01-01

    Transition disks, protoplanetary disks with inner clearings, are promising objects in which to directly image forming planets. The high contrast imaging technique of non-redundant masking is well posed to detect planetary mass companions at several to tens of AU in nearby transition disks. We present non-redundant masking observations of the T Cha and LkCa 15 transition disks, both of which host posited sub-stellar mass companions. However, due to a loss of information intrinsic to the technique, observations of extended sources (e.g. scattered light from disks) can be misinterpreted as moving companions. We discuss tests to distinguish between these two scenarios, with applications to the T Cha and LkCa 15 observations. We argue that a static, forward-scattering disk can explain the T Cha data, while LkCa 15 is best explained by multiple orbiting companions.

  7. Two-tone masking in normal hearing listeners.

    Science.gov (United States)

    Rabinowitz, W M; Bilger, R C; Trahiotis, C; Nuetzel, J

    1980-10-01

    Psychophysical measurements of two-tone masking [E. Zwicker, Acustica 4, 415-420 (1954)] were made at 0.25, 0.5, 1, 2, and 4 kHz utilizing a masker level of 62 dB SPL/tone. Fifty-eight "untrained" subjects were tested using a single run of a 4IFC adaptive procedure for each condition. Individual data were highly variable. Average data were systematic; they were analyzed using a two-line-regression procedure and the obtained critical-bandwidth estimates approximated normative values. Analysis of the literature revealed that a substantial increase of estimated critical bandwidth versus masker level occurs in two-tone masking. A portion of this increase appears artificial and stems from the relative effectiveness of the higher frequency masker tone at high masker levels. An alternative masker-frequency spacing is suggested to reduce level effects. Implications for an underlying critical-band mechanism are discussed.

  8. Neurosarcoidosis-associated central diabetes insipidus masked by adrenal insufficiency.

    Science.gov (United States)

    Non, Lemuel; Brito, Daniel; Anastasopoulou, Catherine

    2015-01-22

    Central diabetes insipidus (CDI) is an infrequent complication of neurosarcoidosis (NS). Its presentation may be masked by adrenal insufficiency (AI) and uncovered by subsequent steroid replacement. A 45-year-old woman with a history of NS presented 2 weeks after abrupt cessation of prednisone with nausea, vomiting, decreased oral intake and confusion. She was diagnosed with secondary AI and intravenous hydrocortisone was promptly begun. Over the next few days, however, the patient developed severe thirst and polyuria exceeding 6 L of urine per day, accompanied by hypernatraemia and hypo-osmolar urine. She was presumed to have CDI due to NS, and intranasal desmopressin was administered. This eventually normalised her urine output and serum sodium. The patient was discharged improved on intranasal desmopressin and oral prednisone. AI may mask the manifestation of CDI because low serum cortisol impairs renal-free water clearance. Steroid replacement reverses this process and unmasks an underlying CDI.

  9. Electron Beam Pattern Writer For X-Ray Masks

    Science.gov (United States)

    Viswanathan, R.; Wilson, A. D.; Lafuente, J.; Voelker, H.; Kern, A.

    1984-03-01

    This paper discusses the capabilities of a vector scan electron-beam system as an X-ray mask writer for pattern geometries at and below one-half micron. The noise level in the deflection system has been reduced to an RMS value of 150 A over a 0.5 mm deflection field, thus making our exposure system usable in the one-quarter micron regime. Pattern geometries below 2000 A have been fabricated on a thin membrane. Drift compensation techniques, implemented in software, have reduced placement errors over the entire mask to less than 700 A. Accomplishments in the areas of noise reduction, bandwidth error compensation, system resolution, and improvements in pattern placement accuracy are discussed.

  10. The JWST/NIRCam Coronagraph: Mask Design and Fabrication

    Science.gov (United States)

    Krista, John E.; Balasubramanian, Kunjithapatha; Beichman, Charles A.; Echternach, Pierre M.; Green, Joseph J.; Liewer, Kurt M.; Muller, Richard E.; Serabyn, Eugene; Shaklan, Stuart B.; Trauger, John T.; Wilson, Daniel W.; Horner, Scott D.; Mao, Yalan; Somerstein, Stephen F.; Vasudevan, Gopal; Kelly, Douglas M.; Rieke, Marcia J.

    2009-01-01

    The NIRCam instrument on the James Webb Space Telescope will provide coronagraphic imaging from lambda =1-5 microns of high contrast sources such as extrasolar planets and circumstellar disks. A Lyot coronagraph with a variety of circular and wedge-shaped occulting masks and matching Lyot pupil stops will be implemented. The occulters approximate grayscale transmission profiles using halftone binary patterns comprising wavelength-sized metal dots on anti-reflection coated sapphire substrates. The mask patterns are being created in the Micro Devices Laboratory at the Jet Propulsion Laboratory using electron beam lithography. Samples of these occulters have been successfully evaluated in a coronagraphic testbed. In a separate process, the complex apertures that form the Lyot stops will be deposited onto optical wedges. The NIRCam coronagraph flight components are expected to be completed this year.

  11. Manikin training for neonatal resuscitation with the laryngeal mask airway.

    Science.gov (United States)

    Gandini, Donna; Brimacombe, Joseph

    2004-06-01

    We describe our experience of brief (training with the laryngeal mask airway (LMA) for neonatal resuscitation in 80 health care workers. Prior to training, 31% had not heard of the LMA, 57% did not know the LMA could be used for neonatal resuscitation and 88% thought it was a disposable device. The mean (SD) range time to insert the LMA after training was 5 (2, 5-16) s and there were no failed insertions. The preferred technique for neonatal resuscitation, before vs after training, changed from 72 to 14% for the face mask (P training was adequate and the LMA should be available on neonatal resuscitation carts. Confidence in using the LMA increased from 8 to 97% (P training.

  12. Robust Face Recognition via Occlusion Detection and Masking

    Directory of Open Access Journals (Sweden)

    Guo Tan

    2016-01-01

    Full Text Available Sparse representation-based classification (SRC method has demonstrated promising results in face recognition (FR. In this paper, we consider the problem of face recognition with occlusion. In sparse representation-based classification method, the reconstruction residual of test sample over the training set is usually heterogeneous with the training samples, highlighting the occlusion part in test sample. We detect the occlusion part by extracting a mask from the reconstruction residual through threshold operation. The mask will be applied in the representation-based classification framework to eliminate the impact of occlusion in FR. The method does not assume any prior knowledge about the occlusion, and extensive experiments on publicly available databases show the efficacy of the method.

  13. Contrast enhanced exposure strategy in multi-beam mask writing

    Science.gov (United States)

    Belic, Nikola; Hofmann, Ulrich; Klikovits, Jan; Martens, Stephan

    2013-03-01

    Since multi electron beam exposure has become a serious contender for next generation mask making, proximity- and process effect corrections (PEC) need to be adapted to this technology. With feature sizes in the order of the short-range blurs (resist and tool), contrast enhancements need to be combined with standard linearity corrections. Different PEC strategies are reviewed and compared with respect to their suitability for multi-beam exposure. This analysis recommends a hybrid approach that combines the benefits of shape- and dose PEC and is optimally applicable for multibeam exposure. Exposure results on the proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC) and a standard 50 kV vector shaped beam tool (VSB) are shown to verify that the combined PEC with overdose contrast enhancement covers the whole pattern range from isolated to opaque.

  14. Development of nanostructured protective "sight glasses" for IR gas sensors

    DEFF Research Database (Denmark)

    Bergmann, René; Davis, Zachary James; Schmidt, Michael Stenbæk

    2011-01-01

    In this work protective "sight glasses" for infrared gas sensors showing a sub-wavelength nanostructure with random patterns have been fabricated by reactive ion etching (RIE) in an easy and comparable cheap single step mask-less process. By an organic coating, the intrinsic water repellent...

  15. Laryngeal mask airway protector™: Advanced uses for laparoscopic cholecystectomies

    Directory of Open Access Journals (Sweden)

    Leng Zoo Tan

    2017-01-01

    Full Text Available The laryngeal mask airway (LMA Protector™ is a second-generation perilaryngeal sealer type supraglottic airway device recently introduced into clinical practice. We describe our initial experiences with the use of the LMA Protector™ in three patients undergoing laparoscopic cholecystectomies. In all patients, we found the LMA Protector™ to have acceptable placements on the first attempt, adequate oropharyngeal leak pressures and ventilation adequacy.

  16. Band-Limited Masks and Direct Imaging of Exoplanets

    Science.gov (United States)

    Kuchner, Marc J.

    2009-01-01

    Band-limited masks have become the baseline design for what is now called "classical TPF" and also the N|RCamcomnagraphonJW8 .This technology remains one of the most promising paths for direct detection ofmxop|anedm and disks. I'll describe some of the latest progress in the implementation of this technique and what we have learned about where it can and can not be effectively applied.

  17. Developmental Effects in the Masking-Level Difference

    Science.gov (United States)

    Hall, Joseph W.; Buss, Emily; Grose, John H.; Dev, Madhu B.

    2004-01-01

    Adults and children (aged 5 years 1 month to 10 years 8 months) were tested in a masking-level difference (MLD) paradigm in which detection of brief signals was contrasted for signal placement in masker envelope maxima versus masker envelope minima. Maskers were 50-Hz-wide noise bands centered on 500 Hz, and the signals were So or S[pi] 30-ms,…

  18. Living kidney donation and masked nationalism in Israel.

    Science.gov (United States)

    Epstein, Miran

    2016-12-13

    This paper draws attention to a current trend of masked conditional-nationalist living kidney donation in Israel, to which the local transplant system has been turning a blind eye. The paper seeks to make the international transplant and bioethics communities aware of this disturbing trend. It also explains why it is wrong and suggests how to tackle it. Finally, it calls on the Israeli system to bring the practice to a halt for the benefit of all parties involved.

  19. Inhibitory masking controls the threshold sensitivity of retinal ganglion cells.

    Science.gov (United States)

    Pan, Feng; Toychiev, Abduqodir; Zhang, Yi; Atlasz, Tamas; Ramakrishnan, Hariharasubramanian; Roy, Kaushambi; Völgyi, Béla; Akopian, Abram; Bloomfield, Stewart A

    2016-11-15

    Retinal ganglion cells (RGCs) in dark-adapted retinas show a range of threshold sensitivities spanning ∼3 log units of illuminance. Here, we show that the different threshold sensitivities of RGCs reflect an inhibitory mechanism that masks inputs from certain rod pathways. The masking inhibition is subserved by GABAC receptors, probably on bipolar cell axon terminals. The GABAergic masking inhibition appears independent of dopaminergic circuitry that has been shown also to affect RGC sensitivity. The results indicate a novel mechanism whereby inhibition controls the sensitivity of different cohorts of RGCs. This can limit and thereby ensure that appropriate signals are carried centrally in scotopic conditions when sensitivity rather than acuity is crucial. The responses of rod photoreceptors, which subserve dim light vision, are carried through the retina by three independent pathways. These pathways carry signals with largely different sensitivities. Retinal ganglion cells (RGCs), the output neurons of the retina, show a wide range of sensitivities in the same dark-adapted conditions, suggesting a divergence of the rod pathways. However, this organization is not supported by the known synaptic morphology of the retina. Here, we tested an alternative idea that the rod pathways converge onto single RGCs, but inhibitory circuits selectively mask signals so that one pathway predominates. Indeed, we found that application of GABA receptor blockers increased the sensitivity of most RGCs by unmasking rod signals, which were suppressed. Our results indicate that inhibition controls the threshold responses of RGCs under dim ambient light. This mechanism can ensure that appropriate signals cross the bottleneck of the optic nerve in changing stimulus conditions. © 2016 The Authors. The Journal of Physiology © 2016 The Physiological Society.

  20. Emotion Potentiates Response Activation and Inhibition in Masked Priming

    Directory of Open Access Journals (Sweden)

    Bruno eBocanegra

    2012-11-01

    Full Text Available Previous studies have shown that emotion can have two-fold effects on perception. At the object-level, emotional stimuli benefit from a stimulus-specific boost in visual attention at the relative expense of competing stimuli. At the visual feature-level, recent findings indicate that emotion may inhibit the processing of small visual details and facilitate the processing of coarse visual features. In the present study, we investigated whether emotion can boost the activation and inhibition of automatic motor responses that are generated prior to overt perception. To investigate this, we tested whether an emotional cue affects covert motor responses in a masked priming task. We used a masked priming paradigm in which participants responded to target arrows that were preceded by invisible congruent or incongruent prime arrows. In the standard paradigm, participants react faster and commit fewer errors responding to the directionality of target arrows, when they are preceded by congruent vs. incongruent masked prime arrows (positive congruency effect: PCE. However, as prime-target SOAs increase, this effect reverses (negative congruency effect: NCE. These findings have been explained as evidence for an initial activation and a subsequent inhibition of a partial response elicited by the masked prime arrow. Our results show that the presentation of fearful face cues, compared to neutral face cues, increased the size of both the PCE and NCE, despite the fact that the primes were invisible. This is the first demonstration that emotion prepares an individual's visuomotor system for automatic activation and inhibition of motor responses in the absence of visual awareness.

  1. Photodeposited diffractive optical elements of computer generated masks

    Energy Technology Data Exchange (ETDEWEB)

    Mirchin, N. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel)]. E-mail: mirchin@hait.ac.il; Peled, A. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Baal-Zedaka, I. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Margolin, R. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Zagon, M. [Electrical and Electronics Engineering Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Lapsker, I. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Verdyan, A. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel); Azoulay, J. [Physics Department, Holon Academic Institute of Technology, 52 Golomb Street, Holon 58102 (Israel)

    2005-07-30

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick.

  2. Photodeposited diffractive optical elements of computer generated masks

    Science.gov (United States)

    Mirchin, N.; Peled, A.; Baal-Zedaka, I.; Margolin, R.; Zagon, M.; Lapsker, I.; Verdyan, A.; Azoulay, J.

    2005-07-01

    Diffractive optical elements (DOE) were synthesized on plastic substrates using the photodeposition (PD) technique by depositing amorphous selenium (a-Se) films with argon lasers and UV spectra light. The thin films were deposited typically onto polymethylmethacrylate (PMMA) substrates at room temperature. Scanned beam and contact mask modes were employed using computer-designed DOE lenses. Optical and electron micrographs characterize the surface details. The films were typically 200 nm thick.

  3. Professional and home-made face masks reduce exposure to respiratory infections among the general population.

    Directory of Open Access Journals (Sweden)

    Marianne van der Sande

    Full Text Available BACKGROUND: Governments are preparing for a potential influenza pandemic. Therefore they need data to assess the possible impact of interventions. Face-masks worn by the general population could be an accessible and affordable intervention, if effective when worn under routine circumstances. METHODOLOGY: We assessed transmission reduction potential provided by personal respirators, surgical masks and home-made masks when worn during a variety of activities by healthy volunteers and a simulated patient. PRINCIPAL FINDINGS: All types of masks reduced aerosol exposure, relatively stable over time, unaffected by duration of wear or type of activity, but with a high degree of individual variation. Personal respirators were more efficient than surgical masks, which were more efficient than home-made masks. Regardless of mask type, children were less well protected. Outward protection (mask wearing by a mechanical head was less effective than inward protection (mask wearing by healthy volunteers. CONCLUSIONS/SIGNIFICANCE: Any type of general mask use is likely to decrease viral exposure and infection risk on a population level, in spite of imperfect fit and imperfect adherence, personal respirators providing most protection. Masks worn by patients may not offer as great a degree of protection against aerosol transmission.

  4. Smart mask ship to control for enhanced on wafer CD performance

    Science.gov (United States)

    Utzny, Clemens; Schumacher, Karl; Seltmann, Rolf

    2016-10-01

    In the process of semicondutcor fabrication the translation of the final product requirements into specific targets for each component of the manufacturing process is one of the most demanding tasks. This involves the careful assessment of the error budgets of each component as well as the sensible balancing of the costs implied by the requirements. Photolithographic masks play a pivotal role in the semiconductor fabrication. This attributes a crucial role to mask error budgeting within the overall wafer production process. Masks with borderline performance with respect to the wafer fabrication requirements have a detrimental effect on the wafer process window thus inducing delays and costs. However, prohibitively strict mask specifications will induce large costs and delays in the mask manufacturing process. Thus setting smart control mechanisms for mask quality assessment is highly relevant for an efficient production flow. To this end GLOBALFOUNDRIES and the AMTC have set up a new mask specification check to enable a smart ship to control process for mask manufacturing. Within this process the mask CD distribution is checked as to whether it is commensurable with the advanced dose control capabilities of the stepper in the wafer factory. If this is the case, masks with borderline CD performance will be usable within the manufacturing process as the signatures can be compensated. In this paper we give a detailed explanation of the smart ship control approach with its implications for mask quality.

  5. Super-Resolution Recording by an Organic Photochromic Mask Layer

    Institute of Scientific and Technical Information of China (English)

    SHI Ming; ZHAO Sheng-Min; YI Jia-Xiang; ZHAO Fu-Qun; NIU Li-Hong; LI Zhong-Yu; ZHANG Fu-Shi

    2007-01-01

    By using the super-resolution near-field structure(super-RENS)method,the super-resolution recording marks are obtained practically by an organic photochromic diarylethene mask layer,under much lower recording laser Dower of 0.45mW.The size of recording marks is decreased by 60% (from 1.6μm to 0.7μm) for a diarylethene (photo-mode)recording layer by the optical detection method(limited by optical diffraction),or decreased by 97%(from 1600nm to 50nm)for a heptaoxyl copper phthalocyanine(thermo-optical)recording layer,the latter is much smaller than the limitation of optical diffraction.In order to obtain a desirable result,a proper extent or Dhotochemistry reaction in the mask layer is needed.Thus,the super-resolution recording marks can be obtained by adjusting the concentration of diarylethene in the mask layer,the recording laser power,and the moving speed of the sample disc.

  6. [Drugs for supplementation in cataract surgery with a laryngeal mask].

    Science.gov (United States)

    Becker, R; Schmidt, W; Viehl, H; Rupp, D

    2002-10-01

    We compared intraocular pressure (IOP), vitreous pressure and several anaesthesiological parameters for patients who underwent cataract surgery with propofol anaesthesia, laryngeal mask and different supplementations with reference to the effect of S-ketamin in particular. In 4 groups with 15 patients cataract surgery (phacoemulsification) was carried out using anaesthesia with propofol, laryngeal masks and spontaneous breathing if possible, supplementation with propofol (0.6 mg/kg, group 1), S-ketamin (0.3 mg/kg, group 2), ketamin (0.6 mg/kg, group 3) or fentanyl (0.5 microgram/kg, group 4); IOP measurement with tonopen XL and scoring vitreous pressure at different times during anaesthesia (score 0-3). For IOP and vitreous pressure, none of the different supplementations showed a significant difference. Insertion of the laryngeal mask did not cause a rise in intraocular pressure. The number of patients with spontaneous breathing during the operation in group 4 was significantly lower than in groups 1-3. No significant differences were observed between the different anaesthesiological parameters. S-Ketamin had no significant effect on IOP and vitreous pressure during phacoemulsification. It offers a safe "handling" of patients because of a high spontaneous breathing rate and lower concentration compared to Ketamin.

  7. Optimized distributed computing environment for mask data preparation

    Science.gov (United States)

    Ahn, Byoung-Sup; Bang, Ju-Mi; Ji, Min-Kyu; Kang, Sun; Jang, Sung-Hoon; Choi, Yo-Han; Ki, Won-Tai; Choi, Seong-Woon; Han, Woo-Sung

    2005-11-01

    As the critical dimension (CD) becomes smaller, various resolution enhancement techniques (RET) are widely adopted. In developing sub-100nm devices, the complexity of optical proximity correction (OPC) is severely increased and applied OPC layers are expanded to non-critical layers. The transformation of designed pattern data by OPC operation causes complexity, which cause runtime overheads to following steps such as mask data preparation (MDP), and collapse of existing design hierarchy. Therefore, many mask shops exploit the distributed computing method in order to reduce the runtime of mask data preparation rather than exploit the design hierarchy. Distributed computing uses a cluster of computers that are connected to local network system. However, there are two things to limit the benefit of the distributing computing method in MDP. First, every sequential MDP job, which uses maximum number of available CPUs, is not efficient compared to parallel MDP job execution due to the input data characteristics. Second, the runtime enhancement over input cost is not sufficient enough since the scalability of fracturing tools is limited. In this paper, we will discuss optimum load balancing environment that is useful in increasing the uptime of distributed computing system by assigning appropriate number of CPUs for each input design data. We will also describe the distributed processing (DP) parameter optimization to obtain maximum throughput in MDP job processing.

  8. Zearalenone-16-O-glucoside: a new masked mycotoxin.

    Science.gov (United States)

    Kovalsky Paris, Maria Paula; Schweiger, Wolfgang; Hametner, Christian; Stückler, Romana; Muehlbauer, Gary J; Varga, Elisabeth; Krska, Rudolf; Berthiller, Franz; Adam, Gerhard

    2014-02-05

    This paper reports the identification of a barley UDP-glucosyltransferase, HvUGT14077, which is able to convert the estrogenic Fusarium mycotoxin zearalenone into a near-equimolar mixture of the known masked mycotoxin zearalenone-14-O-β-glucoside and a new glucose conjugate, zearalenone-16-O-β-glucoside. Biocatalytical production using engineered yeast expressing the HvUGT14077 gene allowed structural elucidation of this compound. The purified zearalenone-16-O-β-glucoside was used as an analytical calibrant in zearalenone metabolization experiments. This study confirmed the formation of this new masked mycotoxin in barley seedlings as well as in wheat and Brachypodium distachyon cell suspension cultures. In barley roots, up to 18-fold higher levels of zearalenone-16-O-β-glucoside compared to the known zearalenone-14-O-β-glucoside were found. Incubation of zearalenone-16-O-β-glucoside with human fecal slurry showed that this conjugate can also be hydrolyzed rapidly by intestinal bacteria, converting the glucoside back to the parental mycotoxin. Consequently, it should be considered as an additional masked form of zearalenone with potential relevance for food safety.

  9. Neurofibromatosis: relinquishing the masks; a quest for quality of life.

    Science.gov (United States)

    Messner, R; Smith, M N

    1986-07-01

    Neurofibromatosis (NF) or von Recklinghausen's disease is mankind's most common neurologic genetic disorder, occurring in one of every 3000 live births. While many individuals with NF suffer disfiguring, disabling, or life-threatening complications, NF is extremely variable in its symptoms, intensity, and progression. For many of its victims, NF is a pseudonym for uncertainty and physical and psychosocial havoc. John Merrick, 'The Elephant Man', endured one of the most severe cases of NF ever recorded. Merrick's rejection by post-Dickensian England forced him to become a sideshow circus attraction just to survive. The essence of nursing intervention with NF patients and their families engaged in the quest for quality of life is to restore them to optimal physical and psychosocial functioning, and, ideally, to help them utilize the experience for growth. Many individuals respond to the frustration of NF and society's reactions to the disorder by the wearing of psychological masks. Likewise, nurses may wear emotional masks as a defence against their own discomfort and fears concerning the disorders. Comprehensive nursing management of NF is realized only as nurses and patients relinquish their respective masks. This article examines the nurse's role in genetic disorders with special considerations presented by NF. Adaptation to NF involves coping with NF and its accompanying sequelae and coping with life as it is affected by NF. The concepts of 'chromosomal coping', 'genetophobia', 'genetic guilt, and 'genetic overload syndrome' are presented and analyzed utilizing the theoretical nursing frameworks of Imogene King and Sister Callista Roy.

  10. Preferred axis of CMB parity asymmetry in the masked maps

    Energy Technology Data Exchange (ETDEWEB)

    Cheng, Cheng [State Key Laboratory of Theoretical Physics, Institute of Theoretical Physics, Chinese Academy of Science, Beijing 100190 (China); Zhao, Wen, E-mail: wzhao7@ustc.edu.cn [CAS Key Laboratory for Researches in Galaxies and Cosmology, Department of Astronomy, University of Science and Technology of China, Chinese Academy of Sciences, Hefei, Anhui 230026 (China); Huang, Qing-Guo [State Key Laboratory of Theoretical Physics, Institute of Theoretical Physics, Chinese Academy of Science, Beijing 100190 (China); Santos, Larissa [CAS Key Laboratory for Researches in Galaxies and Cosmology, Department of Astronomy, University of Science and Technology of China, Chinese Academy of Sciences, Hefei, Anhui 230026 (China)

    2016-06-10

    Both WMAP and Planck data show a significant odd-multipole preference in the large scales of the cosmic microwave background (CMB) temperature anisotropies. If this pattern originates from cosmological effects, then it can be considered a crucial clue for a violation in the cosmological principle. By defining various direction dependent statistics in the full-sky Planck 2015 maps (see, for instance, Naselsky et al. (2012); W. Zhao (2014)), we found that the CMB parity asymmetry has a preferred direction, which is independent of the choices of the statistics. In particular, this preferred axis is strongly aligned with those in the CMB quadrupole and octopole, as well as that in the CMB kinematic dipole, which hints to their non-cosmological origin. In realistic observations, the foreground residuals are inevitable, and should be properly masked out in order to avoid possible misinterpretation of the results. In this paper, we extend our previous analyses to the masked Planck 2015 data. By defining a similar direction dependent statistic in the masked map, we find a preferred direction of the CMB parity asymmetry, in which the axis also coincides with that found in the full-sky analysis. Therefore, our conclusions on the CMB parity violation and its directional properties are confirmed.

  11. Review of literature on the endangered masked bobwhite

    Science.gov (United States)

    Tomlinson, Roy E.

    1972-01-01

    The masked bobwhite (Colinus virginianus ridgwayi) once inhabited restricted areas in southern Arizona and middle Sonora, Mexico. It probably never was a widespread and abundant bird. Ornithologists discovered this race in 1884, presumably during its final decline in Arizona due to overgrazing and a series of droughts. . It was gone from Arizona by 1900. Apparently the bird was not seriously threatened in Sonora until the 1940's when the cattle industry increased there. Only small and scattered populations remain in Sonora today. Although behavior of the masked bobwhite is similar to that of the closely-related eastern bobwhite (C. v. virginianus), the desert variety prefers a mesquite-grassland habitat at elevations of from 1,000 to 4,000 feet, has a later and shorter nesting season, and has more striking sexual plumage. The male's black head and 'robin's red' breast readily identify the bird. Average annual precipitation in the heart of its Sonoran habitat is 13.5 inches, with 75 percent of that occurring during the 3-month period of July through September. Foods consist of small weed and grass seeds, supplemented with invertebrates and green vegetational growth during the summer rainy season. Early attempts at reintroduction of masked bobwhites into Arizona failed. Experiments on propagation and reestablishment and a life history study are currently being carried out by the Bureau of Sport Fisheries and Wildlife in cooperation with the Arizona Fish and Game Department.

  12. Attachment avoidance modulates neural response to masked facial emotion.

    Science.gov (United States)

    Suslow, Thomas; Kugel, Harald; Rauch, Astrid Veronika; Dannlowski, Udo; Bauer, Jochen; Konrad, Carsten; Arolt, Volker; Heindel, Walter; Ohrmann, Patricia

    2009-11-01

    According to recent models of individual differences in attachment organization, a basic dimension of adult attachment is avoidance. Attachment-related avoidance corresponds to tendencies to withdraw from close relationships and to an unwillingness to rely on others. In the formation of attachment orientation during infancy facial emotional interaction plays a central role. There exists an inborn very rapid decoding capacity for facial emotional expression. In this study, functional magnetic resonance imaging was used to examine differences in automatic brain reactivity to facial emotions as a function of attachment avoidance in a sample of 51 healthy adults. Pictures of sad and happy faces (which are approach-related interpersonal signals) were presented masked by neutral faces. The Relationship Scales Questionnaire (RSQ) was used to assess the attachment avoidance. Masked sad faces activated the amygdala, the insula, occipito-temporal areas, and the somatosensory cortices. Independently from trait anxiety, depressivity, and detection performance, attachment avoidance was found to be inversely related to responses of the primary somatosensory cortex (BA 3) to masked sad faces. A low spontaneous responsivity of the primary somatosensory cortex to negative faces could be a correlate of the habitual unwillingness to deal with partners' distress and needs for proximity. The somatosensory cortices are known to be critically involved in the processes of emotional mimicry and simulation which have the potential to increase social affiliation. Our data are consistent with the idea that people who withdraw from close relationships respond spontaneously to a lesser extent to negative interpersonal emotional signals than securely attached individuals.

  13. Pixelated source and mask optimization for immersion lithography.

    Science.gov (United States)

    Ma, Xu; Han, Chunying; Li, Yanqiu; Dong, Lisong; Arce, Gonzalo R

    2013-01-01

    Immersion lithography systems with hyper-numerical aperture (hyper-NA) (NA>1) have become indispensable in nanolithography for technology nodes of 45 nm and beyond. Source and mask optimization (SMO) has emerged as a key technique used to further improve the imaging performance of immersion lithography. Recently, a set of pixelated gradient-based SMO approaches were proposed under the scalar imaging models, which are inaccurate for hyper-NA settings. This paper focuses on developing pixelated gradient-based SMO algorithms based on a vector imaging model that is accurate for current immersion lithography. To achieve this goal, an integrative and analytic vector imaging model is first used to formulate the simultaneous SMO (SISMO) and sequential SMO (SESMO) frameworks. A gradient-based algorithm is then exploited to jointly optimize the source and mask. Subsequently, this paper studies and compares the performance of individual source optimization (SO), individual mask optimization (MO), SISMO, and SESMO. Finally, a hybrid SMO (HSMO) approach is proposed to take full advantage of SO, SISMO, and MO, consequently achieving superior performance.

  14. Progress to First Light for AMASING, an Aperture Masking Instrument

    Science.gov (United States)

    Schmidt, Luke M.; Santoro, F. G.; Jurgenson, C. A.

    2011-01-01

    We report on construction progress for the AMASING (Aperture Masking And Speckle ImagiNG) instrument. AMASING is designed for aperture masking and speckle interferometry at optical wavelengths. This report will focus on three main aspects of the instrument construction. The optical and electronic components have been selected and are assembled in a laboratory. We describe the optical alignment procedures and expected visibility performance across the design wavelengths as well as a discussion on the types of aperture masks developed for the instrument. The support structure and enclosure have been designed to provide a stable platform for the instrument optics. We document the construction, predicted performance and the procedure for aligning the structure with the optical axis of the telescope. Finally we discuss the instrument software control architecture and interface with the telescope. This work has been supported by LANL-NMT MOU UCDRD funding, a College Cost Reduction and Access Act grant to Amarillo College, the New Mexico Space Grant Consortium and the New Mexico Tech Graduate Student Association Matuszeski Research Grant.

  15. FORMULATION AND EVALUATION OF ORODISPERSIBLE TABLETS OF TASTE MASKED NIZATIDINE

    Directory of Open Access Journals (Sweden)

    Radhika Parasuram Rajan

    2012-10-01

    Full Text Available The purpose of the research was to mask the intensely bitter taste of Nizatidine and to formulate Orodispersible tablet (ODT and get rapid onset of action, to increase bioavailability and to increase patient compliance. Orodispersible tablets are an innovative technology, which disperse rapidly, usually in a matter of seconds, without the need for water, providing optimal convenience to the patient. The taste masking was done by complexing Nizatidine with methacrylate copolymer, Eudragit E100 in different ratios by mass extrusion method. The drug polymer complex was optimized by determining the drug content and in vitro drug release in simulated salivary fluid (SSF of pH 6.8. Complex which did not release the drug in SSF was considered as the optimized batch and used for formulation of ODTs. The effects of various superdisintegrants such as Sodium Starch Glycolate, Croscarmellose sodium, Crosspovidone used in formulation of ODTs were studied. The formulation blend was evaluated for bulk density, tapped density, compressibility index, angle of repose etc. The ODTs were prepared by direct compression technique and evaluated for hardness, friability, wetting time, in vitro dispersion time, in vitro drug release etc. Among all formulation, F3 containing 5% w/w concentration of crosspovidone was considered to be the best formulation, with disintegration time of 34 seconds and in vitro drug release of 99.5% in 15 minutes in simulated gastric fluid (SGF. Thus, results conclusively demonstrated successful masking of taste and rapid disintegration of the formulated tablets.

  16. In-flight calibration of the INTEGRAL/IBIS mask

    CERN Document Server

    Soldi, S; Gros, A; Belanger, G; Beckmann, V; Caballero, I; Goldwurm, A; Gotz, D; Mattana, F; Heras, J A Zurita; Bazzano, A; Ubertini, P

    2013-01-01

    Since the release of the INTEGRAL Offline Scientific Analysis (OSA) software version 9.0, the ghost busters module has been introduced in the INTEGRAL/IBIS imaging procedure, leading to an improvement of the sensitivity around bright sources up to a factor of 7. This module excludes in the deconvolution process the IBIS/ISGRI detector pixels corresponding to the projection of a bright source through mask elements affected by some defects. These defects are most likely associated with screws and glue fixing the IBIS mask to its support. Following these major improvements introduced in OSA 9, a second order correction is still required to further remove the residual noise, now at a level of 0.2-1% of the brightest source in the field of view. In order to improve our knowledge of the IBIS mask transparency, a calibration campaign has been carried out during 2010-2012. We present here the analysis of these data, together with archival observations of the Crab and Cyg X-1, that allowed us to build a composite imag...

  17. The technical consideration of multi-beam mask writer for production

    Science.gov (United States)

    Lee, Sang Hee; Ahn, Byung-Sup; Choi, Jin; Shin, In Kyun; Tamamushi, Shuichi; Jeon, Chan-Uk

    2016-10-01

    Multi-beam mask writer is under development to solve the throughput and patterning resolution problems in VSB mask writer. Theoretically, the writing time is appropriate for future design node and the resolution is improved with multi-beam mask writer. Many previous studies show the feasible results of resolution, CD control and registration. Although such technical results of development tool seem to be enough for mass production, there are still many unexpected problems for real mass production. In this report, the technical challenges of multi-beam mask writer are discussed in terms of production and application. The problems and issues are defined based on the performance of current development tool compared with the requirements of mask quality. Using the simulation and experiment, we analyze the specific characteristics of electron beam in multi-beam mask writer scheme. Consequently, we suggest necessary specifications for mass production with multi-beam mask writer in the future.

  18. (EfFacing the Face of Nationalism: Wrestling Masks in Chicano and Mexican Performance Art

    Directory of Open Access Journals (Sweden)

    Robert Neustadt

    2001-06-01

    Full Text Available Masks serve as particularly effective props in contemporary Mexican and Chicano performance art because of a number of deeply rooted traditions in Mexican culture. This essay explores the mask as code of honor in Mexican culture, and foregrounds the manner in which a number of contemporary Mexican and Chicano artists and performers strategically employ wrestling masks to (efface the mask-like image of Mexican or U.S. nationalism. I apply the label "performance artist" broadly, to include musicians and political figures that integrate an exaggerated sense of theatricality into their performances. Following the early work of Roland Barthes, I read performances as "texts" in which the wrestling masks function as immediately recognizable signs . I argue that by masking their identity and alluding to popular mask traditions, Chicano and Mexican performance artists make visible, and interrogate, the national face(s of power.

  19. Gas and Gas Pains

    Science.gov (United States)

    ... problems with gas if you: Are lactose or gluten intolerant Eat a diet rich in fruits, vegetables, whole grains and legumes Drink carbonated beverages Have a chronic intestinal condition, such as irritable bowel syndrome or inflammatory bowel disease Neither age nor sex ...

  20. Optimized qualification protocol on particle cleanliness for EUV mask infrastructure

    Science.gov (United States)

    van der Donck, J. C. J.; Stortelder, J. K.; Derksen, G. B.

    2011-11-01

    With the market introduction of the NXE:3100, Extreme Ultra Violet Lithography (EUVL) enters a new stage. Now infrastructure in the wafer fabs must be prepared for new processes and new materials. Especially the infrastructure for masks poses a challenge. Because of the absence of a pellicle reticle front sides are exceptionally vulnerable to particles. It was also shown that particles on the backside of a reticle may cause tool down time. These effects set extreme requirements to the cleanliness level of the fab infrastructure for EUV masks. The cost of EUV masks justifies the use of equipment that is qualified on particle cleanliness. Until now equipment qualification on particle cleanliness have not been carried out with statistically based qualification procedures. Since we are dealing with extreme clean equipment the number of observed particles is expected to be very low. These particle levels can only be measured by repetitively cycling a mask substrate in the equipment. Recent work in the EUV AD-tool presents data on added particles during load/unload cycles, reported as number of Particles per Reticle Pass (PRP). In the interpretation of the data, variation by deposition statistics is not taken into account. In measurements with low numbers of added particles the standard deviation in PRP number can be large. An additional issue is that particles which are added in the routing outside the equipment may have a large impact on the testing result. The number mismatch between a single handling step outside the tool and the multiple cycling in the equipment makes accuracy of measurements rather complex. The low number of expected particles, the large variation in results and the combined effect of added particles inside and outside the equipment justifies putting good effort in making a test plan. Without a proper statistical background, tests may not be suitable for proving that equipment qualifies for the limiting cleanliness levels. Other risks are that a

  1. UDOF direct improvement by modulating mask absorber thickness

    Science.gov (United States)

    Yu, Tuan-Yen; Lio, En Chuan; Chen, Po Tsang; Wei, Chih I.; Chen, Yi Ting; Peng, Ming Chun; Chou, William; Yu, Chun Chi

    2016-10-01

    As the process generation migrate to advanced and smaller dimension or pitch, the mask and resist 3D effects will impact the lithography focus common window severely because of both individual depth-of-focus (iDOF) range decrease and center mismatch. Furthermore, some chemical or thermal factors, such as PEB (Post Exposure Bake) also worsen the usable depth-of-focus (uDOF) performance. So the mismatch of thru-pitch iDOF center should be considered as a lithography process integration issue, and more complicated to partition the 3D effects induced by optical or chemical factors. In order to reduce the impact of 3D effects induced by both optical and chemical issues, and improve iDOF center mismatch, we would like to propose a mask absorber thickness offset approach, which is directly to compensate the iDOF center bias by adjusting mask absorber thickness, for iso, semi-iso or dense characteristics in line, space or via patterns to enlarge common process window, i.e uDOF, which intends to provide similar application as Flexwave[1] (ASML trademark). By the way, since mask absorber thickness offset approach is similar to focus tuning or change on wafer lithography process, it could be acted as the process tuning method of photoresist (PR) profile optimization locally, PR scum improvement in specific patterns or to modulate etching bias to meet process integration request. For mass production consideration, and available material, current att-PSM blank, quartz, MoSi with chrome layer as hard-mask in reticle process, will be implemented in this experiment, i.e. chrome will be kept remaining above partial thru-pitch patterns, and act as the absorber thickness bias in different patterns. And then, from the best focus offset of thru-pitch patterns, the iDOF center shifts could be directly corrected and to enlarge uDOF by increasing the overlap of iDOF. Finally, some negative tone development (NTD) result in line patterns will be demonstrated as well.

  2. Oxygen-Partial-Pressure Sensor for Aircraft Oxygen Mask

    Science.gov (United States)

    Kelly, Mark; Pettit, Donald

    2003-01-01

    A device that generates an alarm when the partial pressure of oxygen decreases to less than a preset level has been developed to help prevent hypoxia in a pilot or other crewmember of a military or other high-performance aircraft. Loss of oxygen partial pressure can be caused by poor fit of the mask or failure of a hose or other component of an oxygen distribution system. The deleterious physical and mental effects of hypoxia cause the loss of a military aircraft and crew every few years. The device is installed in the crewmember s oxygen mask and is powered via communication wiring already present in all such oxygen masks. The device (see figure) includes an electrochemical sensor, the output potential of which is proportional to the partial pressure of oxygen. The output of the sensor is amplified and fed to the input of a comparator circuit. A reference potential that corresponds to the amplified sensor output at the alarm oxygen-partial-pressure level is fed to the second input of the comparator. When the sensed partial pressure of oxygen falls below the minimum acceptable level, the output of the comparator goes from the low state (a few millivolts) to the high state (near the supply potential, which is typically 6.8 V for microphone power). The switching of the comparator output to the high state triggers a tactile alarm in the form of a vibration in the mask, generated by a small 1.3-Vdc pager motor spinning an eccentric mass at a rate between 8,000 and 10,000 rpm. The sensation of the mask vibrating against the crewmember s nose is very effective at alerting the crewmember, who may already be groggy from hypoxia and is immersed in an environment that is saturated with visual cues and sounds. Indeed, the sensation is one of rudeness, but such rudeness could be what is needed to stimulate the crewmember to take corrective action in a life-threatening situation.

  3. Challenges of anamorphic high-NA lithography and mask making

    Science.gov (United States)

    Hsu, Stephen D.; Liu, Jingjing

    2017-06-01

    Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10

  4. Pengaruh Terapi Oksigen Menggunakan Non-Rebreathing Mask Terhadap Tekanan Parsial CO2 Darah pada Pasien Cedera Kepala Sedang

    Directory of Open Access Journals (Sweden)

    Hendrizal .

    2014-01-01

    Full Text Available AbstrakTekanan parsial CO2sangat berpengaruh terhadap aliran darah otak (ADO dan tekanan intra kanial. Latarbelakang penelitian ini adalah bahwa dalam teori tekanan gas campuran John Dalton dinyatakan bahwa jika salah satu tekanan gas dalam campuran gas bertambah maka tekanan parsial gas lain akan menurun. Penelitian ini bertujuan untuk mengetahui apakah peningkatan konsentrasi oksigen dalam Non-Rebreathing Mask (NRM akan menurunkan tekanan parsial CO2, sehingga dapat digunakan untuk menurunkan PaCO2 sambil memperthankan PaO2 yang tinggi untuk menurunkan TIK (Tekanan Intra Kranial pada pasien cedera kepala. Metode: Penelitian ini merupakan penelitian Clinical Trial dengan rancangan penelitian one shoot pretest and postest pada pasien cedera kepala sedang dengan GCS 9-13 yang dilakukan terapi konservatif di RS Dr. M. Djamil Padang. Pada pasien dinilai tekanan parsial CO2 darah sebelum dan setelah 6 jam terapi oksigen menggunakan NRM. Jumlah sampel sebanyak 16 pasien yang memenuhi kriteria inklusi. Hasil: Dari hasil penelitian didapatkan perbedaan bermakna tekanan parsial CO2 darah sebelum dan setelah terapi oksigen menggunakan NRM (p<0,05. Terjadi penurunan tekanan parsial CO2 darah setelah terapi oksigen mengunakan NRM dari39,00 ± 3,7 menjadi 432,06 ± 6,35. Pembahasan: Terapi oksigen menggunakan NRM dapat menurunkan tekanan parsial CO2 darah sehingga dapat digunakan untuk menurunkan tekanan intrakranial pada pasien cedera kepala sedang.Kata kunci: Terapi Oksigen, Non-Rebreathing Mask, Tekanan Parsial CO2 DarahAbstractThe partial pressure of CO2 is very influential on cerebral blood flow (CBF and intra kanial pressure. The background of this research is that the pressure of the gas mixture in the theory of John Dalton stated that if one of the gas pressure in the gas mixture increases, the partial pressure of other gases will decline. This study aimed to determine whether the increase in oxygen concentration in the non-rebreathing mask (NRM

  5. Gas Sensor

    KAUST Repository

    Luebke, Ryan

    2015-01-22

    A gas sensor using a metal organic framework material can be fully integrated with related circuitry on a single substrate. In an on-chip application, the gas sensor can result in an area-efficient fully integrated gas sensor solution. In one aspect, a gas sensor can include a first gas sensing region including a first pair of electrodes, and a first gas sensitive material proximate to the first pair of electrodes, wherein the first gas sensitive material includes a first metal organic framework material.

  6. UNMASKING MASKED HYPERTENSION: PREVALENCE, CLINICAL IMPLICATIONS, DIAGNOSIS, CORRELATES, AND FUTURE DIRECTIONS

    Science.gov (United States)

    Peacock, James; Diaz, Keith M.; Viera, Anthony J.; Schwartz, Joseph E.; Shimbo, Daichi

    2014-01-01

    Masked hypertension’ is defined as having non-elevated clinic blood pressure (BP) with elevated out-of-clinic average BP, typically determined by ambulatory BP monitoring. Approximately 15–30% of adults with non-elevated clinic BP have masked hypertension. Masked hypertension is associated with increased risks of cardiovascular morbidity and mortality compared to sustained normotension (non-elevated clinic and ambulatory BP), which is similar to or approaching the risk associated with sustained hypertension (elevated clinic and ambulatory BP). The confluence of increased cardiovascular risk and a failure to be diagnosed by the conventional approach of clinic BP measurement makes masked hypertension a significant public health concern. However, many important questions remain. First, the definition of masked hypertension varies across studies. Further, the best approach in the clinical setting to exclude masked hypertension also remains unknown. It is unclear whether home BP monitoring is an adequate substitute for ambulatory BP monitoring in identifying masked hypertension. Few studies have examined the mechanistic pathways that may explain masked hypertension. Finally, scarce data are available on the best approach to treating individuals with masked hypertension. Herein, we review the current literature on masked hypertension including definition, prevalence, clinical implications, special patient populations, correlates, issues related to diagnosis, treatment, and areas for future research. PMID:24573133

  7. Smart way to determine and guarantee mask specifications: tradeoff between cost and quality

    Science.gov (United States)

    Shigemitsu, Fumiaki

    2009-04-01

    Mask set price is soaring along with technology node advancement. One reason is that the number of masks per set is increasing with the geometry scaling. Another reason is that low k1 lithography with highly complex OPCs tightens dimensional mask specifications as to result in higher mask-making tool costs and lower production yield. Under these circumstances, tool cost reduction and production yield improvement are immensely required to reduce mask cost. Expensive quality-assured tools are indispensable to achieve the desired accuracy. Then, higher throughput and technical applicability of the same tool over multiple generations are definitely needed to improve total tool CoO. Meanwhile, not only such conventional basic approaches as improving field level and process performance but optimizing mask specifications efficiently is emerging as a key factor for keeping mask production yield high. Usually mask specifications are determined by the error budget allocated from the total lithography budget. In order to cope with the tighter specifications some sensible approaches have recently been proposed. Mask DFM is receiving particular attention as a new method being strongly linked to lithography and wafer fabrication technologies (1)(2)(3)(4). In this presentation, logical way to define the main mask specifications such as CD, defect and image placement accuracy is shown and sensible ways to sustain them are referred.

  8. Priming of Visual Search Facilitates Attention Shifts: Evidence From Object-Substitution Masking.

    Science.gov (United States)

    Kristjánsson, Árni

    2016-03-01

    Priming of visual search strongly affects visual function, releasing items from crowding and during free-choice primed targets are chosen over unprimed ones. Two accounts of priming have been proposed: attentional facilitation of primed features and postperceptual episodic memory retrieval that involves mapping responses to visual events. Here, well-known masking effects were used to assess the two accounts. Object-substitution masking has been considered to reflect attentional processing: It does not occur when a target is precued and is strengthened when distractors are present. Conversely, metacontrast masking has been connected to lower level processing where attention exerts little effect. If priming facilitates attention shifts, it should mitigate object-substitution masking, while lower level masking might not be similarly influenced. Observers searched for an odd-colored target among distractors. Unpredictably (on 20% of trials), object-substitution masks or metacontrast masks appeared around the target. Object-substitution masking was strongly mitigated for primed target colors, while metacontrast masking was mostly unaffected. This argues against episodic retrieval accounts of priming, placing the priming locus firmly within the realm of attentional processing. The results suggest that priming of visual search facilitates attention shifts to the target, which allows better spatiotemporal resolution that overcomes object-substitution masking.

  9. Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

    Science.gov (United States)

    Matsuoka, Yoichi; Seki, Junichi; Nakayama, Takahiro; Nakagawa, Kazuki; Azuma, Hisanobu; Yamamoto, Kiyohito; Sato, Chiaki; Sakai, Fumio; Takabayashi, Yukio; Aghili, Ali; Mizuno, Makoto; Choi, Jin; Jones, Chris E.

    2016-10-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

  10. Fabrication of nano-structures on glass substrate by modified nano-imprint patterning with a plasma-induced surface-oxidized Cr mask

    Science.gov (United States)

    Lee, So Hee; Lee, Su Yeon; Lee, Seong Eui; Lee, Heon; Lee, Hee Chul

    2014-03-01

    In this study, we introduce a process for fabrication of nano-sized structural arrays on glass using modified nano-imprint patterning. A PVC (polyvinyl chloride) stamp was prepared by hot embossing, and a Cr-oxide-pattern etch-mask was used. The etch-mask was formed by oxidizing the surface of exposed Cr region by oxygen plasma treatment at room temperature. The fabrication of the etch-mask was conducted by immersing the locally oxidized Cr pattern in resin remover and Cr-etchant. The residual UV resin and un-oxidized Cr pattern were selectively removed, resulting in the obvious array of Cr-oxide etch-mask-pattern. The array of glass nano-structures was formed by reactive ion etching (RIE) using CF4 and Ar gas discharge. After removing the Cr-oxide mask, the final nano-structure had a height of 40 nm and a diameter of 170 nm, which was slightly less than the diameter of the original master-mold. The plasma treatment gave rise to a rough glass surface with root-mean-square (RMS) roughness of 29.25 nm, while that of bare glass was 0.66 nm. A high optical transmittance due to reduction in reflectance was observed at the plasma-treated rough surface, as well as for the array of nano-structures. The highest measured optical transmittance was 97.2% at a wavelength of 550 nm; an increase of about 7.2% compared to bare glass.

  11. Polymer masks for structured surface and plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Vital, Alexane [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Groupe de Recherches sur l’Énergétique des Milieux Ionisés (GREMI), Polytech’Orléans, 14 rue d’Issoudun, B.P. 6744, F45067 Orléans Cedex 2 (France); Vayer, Marylène, E-mail: marylene.vayer@univ-orleans.fr [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Sinturel, Christophe [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Rémi [Groupe de Recherches sur l’Énergétique des Milieux Ionisés (GREMI), Polytech’Orléans, 14 rue d’Issoudun, B.P. 6744, F45067 Orléans Cedex 2 (France)

    2015-03-30

    Graphical abstract: - Highlights: • Sub-micrometric silicon structures were prepared by cryogenic plasma etching. • Polymer templates based on phase-separated films of PS/PLA were used. • Silica structured masks were prepared by filling the polymer templates. • Etching of underlying silicon through silica templates gave original structures. - Abstract: Silica and silicon structures have been prepared at the sub-micrometer length-scale, using laterally phase-separated thin films of poly(styrene) (PS) and poly(lactic acid) (PLA) homopolymer blends. The selective removal of one polymer and the filling of the released space by silica precursor solution led, after calcination, to silica structures on silicon such as arrays of bowl-shape features or pillars, layers with through or non-through cylindrical holes, which has not been observed for some of them. The control of the morphology of the initial polymer film was a key point to achieve such type of structures. Particularly relevant was the use of solvent vapor annealing (vs thermal annealing) of the initial spin-coated films that favored and stabilized laterally phase-separated morphologies. Characteristic dimension of the domains were shown to be coupled with the thickness of the film, thinner films giving smaller domain sizes. Despite a relatively high incompatibility of the two polymers, a macro-phase separation was prevented in all the studied conditions. Sub-micrometric domains were formed, and for the thinner films, nanometric domains as small as 74 nm in size can be obtained. The silica structures formed by the infiltration of the polymer templates were used as hard masks for the cryogenic etching of underlying silicon. New structured surfaces, arrays of silicon pillars which can be plain or hollow at the upper part or arrays of cylindrical holes were formed. A selectivity as high as 21 was obtained using this type of mask for 1.5 μm deep holes having a typical diameter of 200 nm.

  12. SU-8 negative photoresist for optical mask manufacturing

    Science.gov (United States)

    Bogdanov, Alexei L.

    2000-06-01

    The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive e-beam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching. However, difficult CD control due to the acid catalyzer diffusion and quite narrow post exposure bake (PEB) process window are some of the major drawbacks of these resists. SU-8 is recently introduced to the market negative photoresist. High sensitivity, fairly good adhesion properties, and relatively simple processing of SU-8 make it a good substitution for novolac based chemically amplified negative e-beam resists in optical mask manufacturing. The replacement of traditional chemically amplified resists by SU- 8 can increase the process latitude and reduce resist costs. Among the obvious drawbacks of SU-8 are the use of solvent- based developer and demand of oxygen plasma for resist removal. In this paper the use of SU-8 for optical mask manufacturing is reported. All steps of resist film preparation, exposure and development are paid a share of attention. Possibilities to use reactive ion etching (RIE) with oxygen in order to increase resist mask contrast are discussed. Special exposure strategy (pattern outlining) was employed to further improve the edge definition. The resist PEB temperature and time were studied to estimate their weight in overall CD control performance. Specially designed test patterns with 0.25 micrometer design rule could be firmly transferred into a chromium layer both by wet etching and ion milling. Influence of exposure dose variation on the pattern CD change was studied.

  13. Study of shape evaluation for mask and silicon using large field of view

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Shinoda, Shinichi; Toyoda, Yasutaka

    2010-09-01

    We have developed a highly integrated method of mask and silicon metrology. The aim of this integration is evaluating the performance of the silicon corresponding to Hotspot on a mask. It can use the mask shape of a large field, besides. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. Currently, as semiconductor manufacture moves towards even smaller feature size, this necessitates more aggressive optical proximity correction (OPC) to drive the super-resolution technology (RET). In other words, there is a trade-off between highly precise RET and mask manufacture, and this has a big impact on the semiconductor market that centers on the mask business. As an optimal solution to these issues, we provide a DFM solution that extracts 2-dimensional data for a more realistic and error-free simulation by reproducing accurately the contour of the actual mask, in addition to the simulation results from the mask data. On the other hand, there is roughness in the silicon form made from a mass-production line. Moreover, there is variation in the silicon form. For this reason, quantification of silicon form is important, in order to estimate the performance of a pattern. In order to quantify, the same form is equalized in two dimensions. And the method of evaluating based on the form is popular. In this study, we conducted experiments for averaging method of the pattern (Measurement Based Contouring) as two-dimensional mask and silicon evaluation technique. That is, observation of the identical position of a mask and a silicon was considered. The result proved its detection accuracy and reliability of variability on two-dimensional pattern (mask and silicon) and is adaptable to following fields of mask quality management. •Discrimination of nuisance defects for fine pattern. •Determination of two-dimensional variability of

  14. Enhancing EUV mask blanks usability through smart shift and blank-design pairing optimization

    Science.gov (United States)

    Soni, Rakesh Kumar; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter; Thwaite, Peter

    2016-10-01

    EUV Defect avoidance techniques will play a vital role in extreme ultraviolet lithography (EUVL) photomask fabrication with the anticipation that defect free mask blanks won't be available and that cost effective techniques will not be available for defect repairing. In addition, mask shops may not have a large inventory of expensive EUV mask blanks. Given these facts, defect avoidance can be used as cost effective technique to optimize the mask blank and design data (mask data) pair selection across mask blank manufacturers and mask shops so that overall mask blank utilization can be enhanced. In previous work, it was determined that the pattern shift based solution increases the chance that a defective mask blank can be used that would otherwise be discarded [1]. In pattern shift, design data is shifted such that defects are either moved to isolated regions or hidden under the patterns that are written. However pattern shifts techniques don't perform well with masks with higher defect counts. Pattern shift techniques in this form assume all defects to be equally critical. In addition, a defect is critical or important only if it lands on the main pattern. A defect landing on fill, sub-resolution assist feature (SRAF) or fiducial areas may not be critical. In this paper we assess the performance of pattern shift techniques assuming defects that are not critical based upon size or type, as well as defects landing in non-critical areas (smart shift) can be ignored. In a production mask manufacturing environment it is necessary to co-optimize and prioritize blank-design pairing for multiple mask layouts in the queue with the available blanks. A blank-design pairing tool maximizes the utilization of blanks by finding the best pairing between blanks and design data so that the maximum number of mask blanks can be used. In this paper we also propose a novel process which would optimize the usage of costly EUV mask blanks across mask blank manufacturers and mask shops

  15. Vector wave diffraction pattern of slits masked by polarizing devices

    Indian Academy of Sciences (India)

    Mohammad Tahir; K Bhattacharya; A K Chakraborty

    2012-03-01

    Polarization property is important to the optical imaging system. It has recently been understood that the polarization properties of light can be fruitfully used for improving the characteristics of imaging system that includes polarizing devices. The vector wave imagery lends an additional degree of freedom that can be utilized for obtaining results that are unobtainable in scalar wave imagery. This calls for a systematic study of diffraction properties of different apertures using polarization-sensitive devices. In the present paper, we have studied the Fraunhofer diffraction pattern of slits masked by different kinds of polarizing devices which introduce a phase difference between the two orthogonal components of the incident beam.

  16. Social mask or persona in Tennesse Williams's women chracters

    OpenAIRE

    Filiz Çevik Tan

    2014-01-01

    Common etymon of word “personality” in foreign languages is based on the word “persona”. Meaning of the word “persona”, in latin, is the mask the stage actors use. Jung, defining the “Persona” as a concept within the scope of analytic psychology, sees it as a functional cover, a form of spiritual behavior, which responds to daily needs of the person. When both definitions are read simultaneously the “persona” shall become the “social mask”.In brief; in order to receive acknowledgement-and not...

  17. Synchronized chaotic phase masks for encrypting and decrypting images

    Science.gov (United States)

    Rueda, Edgar; Vera, Carlos A.; Rodríguez, Boris; Torroba, Roberto

    2008-12-01

    This paper presents an alternative to secure exchange of encrypted information through public open channels. Chaotic encryption introduces a security improvement by an efficient masking of the message with a chaotic signal. Message extraction by an authorized end user is done using a synchronization procedure, thus allowing a continuous change of the encrypting and decrypting keys. And optical implementation with a 4f optical encrypting architecture is suggested. Digital simulations, including the effects of missing data, corrupted data and noise addition are shown. These results proof the consistency of the proposal, and demonstrate a practical way to operate with it.

  18. Musical Sound Separation Based on Binary Time-Frequency Masking

    Directory of Open Access Journals (Sweden)

    Wang DeLiang

    2009-01-01

    Full Text Available The problem of overlapping harmonics is particularly acute in musical sound separation and has not been addressed adequately. We propose a monaural system based on binary time-frequency masking with an emphasis on robust decisions in time-frequency regions, where harmonics from different sources overlap. Our computational auditory scene analysis system exploits the observation that sounds from the same source tend to have similar spectral envelopes. Quantitative results show that utilizing spectral similarity helps binary decision making in overlapped time-frequency regions and significantly improves separation performance.

  19. Cold Regions Environmental Test of CB Protective Masks.

    Science.gov (United States)

    1986-11-01

    Suspenders, pack, combat 1 Protective mask 1 Lipstick , antichap, cold climate 1 C-I TOP 8-4-006 1 November 1986 Item Quantity Sunglasses w/case 1 Box...match, waterproof w/matches I Personal items (i.e., cigarettes, matches, As desired notebook, pencil, etc.) *Either coat or parka or both depending upon...Rucksack 1 Socks, cushion sole 2 Liner, trousers 1 Inserts, mitten, trigger finger 1 Bag, sleeping, type 11 1 Case, water repellent 1 Bag, waterproof 1

  20. Generalization of Supervised Learning for Binary Mask Estimation

    DEFF Research Database (Denmark)

    May, Tobias; Gerkmann, Timo

    2014-01-01

    This paper addresses the problem of speech segregation by es- timating the ideal binary mask (IBM) from noisy speech. Two methods will be compared, one supervised learning approach that incorporates a priori knowledge about the feature distri- bution observed during training. The second method...... solely relies on a frame-based speech presence probability (SPP) es- timation, and therefore, does not depend on the acoustic con- dition seen during training. We investigate the influence of mismatches between the acoustic conditions used for training and testing on the IBM estimation performance...

  1. A mask quality control tool for the OSIRIS multi-object spectrograph

    Science.gov (United States)

    López-Ruiz, J. C.; Vaz Cedillo, Jacinto Javier; Ederoclite, Alessandro; Bongiovanni, Ángel; González Escalera, Víctor

    2012-09-01

    OSIRIS multi object spectrograph uses a set of user-customised-masks, which are manufactured on-demand. The manufacturing process consists of drilling the specified slits on the mask with the required accuracy. Ensuring that slits are on the right place when observing is of vital importance. We present a tool for checking the quality of the process of manufacturing the masks which is based on analyzing the instrument images obtained with the manufactured masks on place. The tool extracts the slit information from these images, relates specifications with the extracted slit information, and finally communicates to the operator if the manufactured mask fulfills the expectations of the mask designer. The proposed tool has been built using scripting languages and using standard libraries such as opencv, pyraf and scipy. The software architecture, advantages and limits of this tool in the lifecycle of a multiobject acquisition are presented.

  2. Thresholds of visibility for masked lexical, non-lexical, and non-linguistic items in aphasia

    OpenAIRE

    2015-01-01

    Introduction Visual masking of primes is a method used to tap into automatic processing while reducing or eliminating conscious processing of the primes. Masking is achieved by presenting primes very rapidly and preceding and/or following them with additional visual stimuli that interfere with conscious processing of the primes (Greenwald, Klinger & Liu, 1989; Forster, Mohan & Hector, 2003). A recent series of studies using masked priming with aphasia (Silkes, Dierkes & Kendall, 2012;...

  3. Joint Service Aircrew Mask (JSAM) - Strategic Aircraft (SA): Noise Attenuation Performance

    Science.gov (United States)

    2015-08-25

    AFRL-RH-WP-TP-2015-0026 Joint Service Aircrew Mask (JSAM) – Strategic Aircraft (SA): Noise Attenuation Performance...2015 – July 2015 4. TITLE AND SUBTITLE Joint Service Aircrew Mask (JSAM) – Strategic Aircraft (SA): Noise Attenuation Performance 5a. CONTRACT...determine if the Joint Service Aircrew Mask (JSAM) –Strategic Aircraft (SA) performance specification requirements were being met. The requirement stated

  4. Joint Service Aircrew Mask (JSAM) - Joint Strike Fighter (JSF): Speech Intelligibility Performance

    Science.gov (United States)

    2015-05-18

    AFRL-RH-WP-TP-2015-0028 Joint Service Aircrew Mask (JSAM) – Joint Strike Fighter (JSF): Speech Intelligibility Performance...COVERED (From - To) June 2014 – April 2015 4. TITLE AND SUBTITLE Joint Service Aircrew Mask (JSAM) – Joint Strike Fighter (JSF): Speech Intelligibility...Method for Measuring the Intelligibility of Speech over Communication Systems on the Joint Service Aircrew Mask (JSAM) – Joint Strike Fighter (JSF) with

  5. Evaluation of the Basic Airway Model, a novel mask ventilation training manikin.

    Science.gov (United States)

    Sudhir, G; Stacey, M R W; Hampson, M; Mecklenburgh, J

    2007-09-01

    The Basic Airway Model is an airway manikin designed for training in mask ventilation. We investigated the ability of the Basic Airway Model to provide varying levels of difficulty for mask ventilation. Volunteers with three levels of experience (novice, intermediate and expert) attempted to ventilate the manikin at three levels of difficulty: easy, intermediate and difficult. The distribution of frequencies of successful ventilation by different groups at the three levels of difficulty were statistically significant (p mask ventilation training.

  6. Comparison of classic laryngeal mask airway with Ambu laryngeal mask for tracheal tube exchange: A prospective randomized controlled study

    Directory of Open Access Journals (Sweden)

    Shruti Jain

    2013-01-01

    Full Text Available Background and Aim: Exchanging endotracheal tube (ETT with classic laryngeal mask airway TM (CLMA TM prior to emergence from anaesthesia is a safe technique to prevent the coughing and haemodynamic changes during extubation. We had compared CLMA TM and AMBU laryngeal mask TM (ALM TM during ETT/laryngeal mask (LM for haemodynamic changes and other parameters. Methods: A total of 100 American Society of Anesthesiologist Grade I and II adult female patients undergoing elective laparoscopic cholecystectomy under general anaesthesia were selected and randomly divided into two groups of 50 patients each. In Group I, CLMA TM and in Group II, ALM TM was placed prior to tracheal extubation. Haemodynamic parameters were recorded during ETT/LM exchange. Glottic view was seen through the LM using flexible fibrescope. Coughing/bucking during removal of LM, ease of placement and post-operative sore throat for both groups were graded and recorded. Statistical Analysis: Data within the groups was analysed using paired t-test while between the groups was analysed using unpaired t-test. Chi-square test was used to analyse grades of glottic view, coughing, and post-operative sore throat. Results: In Group I, there was a significant rise in systolic blood pressure and heart rate in contrast to insignificant rise in Group II. Glottis view was significantly better in Group II. Incidence of coughing, ease of placement and post-operative sore throat was identical between both groups. Conclusion: ALM TM is superior to CLMA TM for exchange of ETT before extubation due to greater haemodynamic stability during exchange phase and is better positioned.

  7. U.S. Army Chemical Corps Historical Studies Gas Warfare in World War I: The 26th Division East of the Meuse, September 1918

    Science.gov (United States)

    1960-10-01

    and 139 artillerymen, or 237* The gas fire and the HE bombardment that began as the raiders advanced and continued through the day destroyed all...not distinguish between the projector 34 attack and the later gas fire * The Regimental Gas Officer of the 103rd Infantry thought no more than 300...strongpoints in the Bois de Crepion, Ravin de la Hazelle, and Ravin du Chuchu, masking the gas fire with high explosives. A mortar platoon of the 1st Gas

  8. Performance of an Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin; Belikov, Ruslan; Pluzhnik, Eugene; Balasubramanian, Kunjithapatham; Wilson, Dan

    2014-01-01

    Coronagraph technology combined with wavefront control is close to achieving the contrast and inner working angle requirements in the lab necessary to observe the faint signal of an Earth-like exoplanet in monochromatic light. An important remaining technological challenge is to achieve high contrast in broadband light. Coronagraph bandwidth is largely limited by chromaticity of the focal plane mask, which is responsible for blocking the stellar PSF. The size of a stellar PSF scales linearly with wavelength; ideally, the size of the focal plane mask would also scale with wavelength. A conventional hard-edge focal plane mask has a fixed size, normally sized for the longest wavelength in the observational band to avoid starlight leakage. The conventional mask is oversized for shorter wavelengths and blocks useful discovery space. Recently we presented a solution to the size chromaticity challenge with a focal plane mask designed to scale its effective size with wavelength. In this paper, we analyze performance of the achromatic size-scaling focal plane mask within a Phase Induced Amplitude Apodization (PIAA) coronagraph. We present results from wavefront control around the achromatic focal plane mask, and demonstrate the size-scaling effect of the mask with wavelength. The edge of the dark zone, and therefore the inner working angle of the coronagraph, scale with wavelength. The achromatic mask enables operation in a wider band of wavelengths compared with a conventional hard-edge occulter.

  9. Novel approaches to the design of halftone masks for analog lithography.

    Science.gov (United States)

    Teschke, Marcel; Sinzinger, Stefan

    2008-09-10

    We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.

  10. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems.

    Science.gov (United States)

    Ma, Xu; Arce, Gonzalo R

    2009-07-01

    Recently, a set of generalized gradient-based optical proximity correction (OPC) optimization methods have been developed to solve for the forward and inverse lithography problems under the thin-mask assumption, where the mask is considered a thin 2D object. However, as the critical dimension printed on the wafer shrinks into the subwavelength regime, thick-mask effects become prevalent, and thus these effects must be taken into account in OPC optimization methods. OPC methods derived under the thin-mask assumption have inherent limitations and perform poorly in the subwavelength regime. This paper focuses on developing model-based forward binary mask optimization methods that account for the thick-mask effects of coherent imaging systems. The boundary layer (BL) model is exploited to simplify and characterize the thick-mask effects, leading to a model-based OPC method. The BL model is simpler than other thick-mask models, treating the near field of the mask as the superposition of the interior transmission areas and the boundary layers. The advantages and limitations of the proposed algorithm are discussed, and several illustrative simulations are presented.

  11. Binary mask optimization for forward lithography based on boundary layer model in coherent systems

    Science.gov (United States)

    Ma, Xu; Arce, Gonzalo R.

    2010-04-01

    Recently, a set of generalized gradient-based optical proximity correction (OPC) optimization methods have been developed to solve for the forward and inverse lithography problem under the thin-mask assumption, where the mask is considered a thin 2-D object. However, as the critical dimension printed on the wafer shrinks into the subwavelength regime, thick-mask effects become prevalent and thus these effects must be taken into account in OPC optimization methods. OPC methods derived under the thin-mask assumption have inherent limitations and perform poorly in the subwavelength scenario. This paper focuses on developing model-based forward binary mask optimization methods which account for the thick-mask effects of coherent imaging systems. The boundary layer (BL) model is exploited to simplify and characterize the thick-mask effects, leading to a computationally efficient OPC method. The BL model is simpler than other thick-mask models, treating the near field of the mask as the superposition of the interior transmission areas and the boundary layers. The advantages and limitations of the proposed algorithm are discussed and several illustrative simulations are presented.

  12. Long-range tactile masking occurs in the postural body schema.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2016-02-01

    Long-range tactile masking has been reported between mirror symmetric body locations. This suggests a general principle of contralateral inhibition between corresponding points on each side of the body that may serve to enhance distinguishing touches on the two halves of the body. Do such effects occur before or after posture is added to the body schema? Here, we address this question by exploring the effect of arm position on long-range tactile masking. The influence of arm position was investigated using different positions of both the test and masking arms. Tactile sensitivity was measured on one forearm, while vibrotactile-masking stimulation was applied to the opposite arm or to a control site on the shoulder. No difference was found in sensitivity when test arm position was varied. Physical contact between the arms significantly increased the effectiveness of a masking stimulus applied to the other arm. Long-range masking between the arms was strongest when the arms were held parallel to each other and was abolished if the position of either the test arm or the masking arm was moved from this position. Modulation of the effectiveness of masking by the position of both the test and masking arms suggests that these effects occur after posture information is added to the body's representation in the brain.

  13. Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

    DEFF Research Database (Denmark)

    Berini, Abadal Gabriel; Boisen, Anja; Davis, Zachary James;

    1999-01-01

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromecha......A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production...

  14. The Bawdy, Brawling, Boisterous World of Korean Mask Dance Dramas: A Brief Essay to Accompany Photographs

    Directory of Open Access Journals (Sweden)

    CedarBough Saeji

    2012-09-01

    Full Text Available Korean mask dance dramas are captivating and entrancing. Comedy, tragedy, and social commentary meld with energetic dance, distinctive masks, and lively music. These dramas are often colloquially and incorrectly referred to as talchum (“mask dance” in Korean—in fact, talchum is one of the major variants of mask dance drama from Hwanghae Province in present-day North Korea. Performers of other variants have long objected to the broad application of the term (akin to calling all in-line skates “Rollerblades” or all MP3 players “iPods”. Only in the late 1990s did academia catch on, when two highly respected midcareer mask dance drama scholars, Bak Jintae (Daegu University and Jeon Kyungwook (Korea University, began to use the terminology talnoli (“mask play” and gamyeon-geuk (“mask drama” in their publications.I needed to watch only one performance, in 1997, to fall in love with the mask dance dramas, but at first the many forms of the genre melded together in my mind. It took repeated exposure and study over more than a dozen years for me to see the profound similarities and differences among all of Korea’s mask dance dramas...

  15. Multi column cell (MCC) e-beam exposure system for mask writing

    Science.gov (United States)

    Yasuda, Hiroshi; Yamada, Akio; Yamabe, Masaki

    2008-05-01

    Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started a 4-year development program for the total optimization of mask design, drawing, and inspection technologies to reduce photomask manufacturing costs in 2006. At the Mask Writing Equipment Technology Research Laboratory, we are developing an e-beam exposure system introducing concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam), which has several times higher throughput than currently commercially available e-beam writing systems.

  16. Evaluation of CS (o-chlorobenzylidene malononitrile) concentrations during U.S. Army mask confidence training.

    Science.gov (United States)

    Hout, Joseph J; Kluchinsky, Timothy; LaPuma, Peter T; White, Duvel W

    2011-10-01

    All soldiers in the U.S. Army are required to complete mask confidence training with o-chlorobenzylidene malononitrile (CS). To instill confidence in the protective capability of the military protective mask, CS is thermally dispersed in a room where soldiers wearing military protective masks are required to conduct various physical exercises, break the seal of their mask, speak, and remove their mask. Soldiers immediately feel the irritating effects of CS when the seal of the mask is broken, which reinforces the mask's ability to shield the soldier from airborne chemical hazards. In the study described in this article, the authors examined the CS concentration inside a mask confidence chamber operated in accordance with U.S. Army training guidelines. The daily average CS concentrations ranged from 2.33-3.29 mg/m3 and exceeded the threshold limit value ceiling, the recommended exposure limit ceiling, and the concentration deemed immediately dangerous to life and health. The minimum and maximum CS concentration used during mask confidence training should be evaluated.

  17. Effectiveness of three just-in-time training modalities for N-95 mask fit testing.

    Science.gov (United States)

    Jones, David; Stoler, Genevieve; Suyama, Joe

    2013-01-01

    To compare and contrast three different training modalities for fit testing N-95 respirator face masks. Block randomized interventional study. Urban university. Two hundred eighty-nine medical students. Students were randomly assigned to video, lecture, or slide show to evaluate the effectiveness of the methods for fit testing large groups of people. Ease of fit and success of fit for each instructional technique. Mask 1 was a Kimberly-Clark duckbill N-95 respirator mask, and mask 2 was a 3M™ carpenters N-95 respirator mask. "Ease of fit" was defined as the ability to successfully don a mask in less than 30 seconds. "Success of fit" was defined as the ability to correctly don a mask in one try. There were no statistical differences by training modality for either mask regarding ease of fit or success of fit. There were no differences among video presentation, small group demonstration, and self-directed slide show just-in-time training modalities for ease of fit or success of fit N-95 respirator mask fitting. Further study is needed to explore more effective fit training modalities.

  18. Combining mask and OPC process verification for improved wafer patterning and yield

    Science.gov (United States)

    Hamouda, Ayman; Abdelghany, Hesham

    2016-10-01

    As technology advances into deep submicron nodes, the mask manufacturing process accuracy become more important. Mask Process Correction (MPC) has been transitioning from Rules-Based Mask Process correction to Model-Based Mask Process Correction mode. MPC is a subsequent step to OPC, where additional perturbation is applied to the mask shapes to correct for the mask manufacturing process. Shifting towards full model-based MPC is driven mainly by the accuracy requirements in advanced technology nodes, both for DUV and EUV processes. In the current state-of-the-art MPC process, MPC is completely decoupled from OPC, where each of them assumes that the other is executing perfectly. However, this decoupling is not suitable anymore due to the limited tolerance in the mask CDU budget and the increased wafer CDU requirements required from OPC. It is becoming more important to reduce any systematic mask errors, especially where they matter the most. In this work, we present a new combined-verification methodology that allows testing the combined effect of mask process and lithography process together and judging the final wafer patterning quality. This has the potential to intercept risks due to superposition of OPC and MPC correction residual errors, and capturing and correcting such a previously hidden source of patterning degradation.

  19. Progress on EUV mask fabrication for 32-nm technology node and beyond

    Science.gov (United States)

    Zhang, Guojing; Yan, Pei-Yang; Liang, Ted; Park, Seh-jin; Sanchez, Peter; Shu, Emily Y.; Ultanir, Erdem A.; Henrichs, Sven; Stivers, Alan; Vandentop, Gilroy; Lieberman, Barry; Qu, Ping

    2007-05-01

    Extreme ultraviolet lithography (EUVL) tool development achieved a big milestone last year as two full-field Alpha Demo Tools (ADT) were shipped to customers by ASML. In the future horizon, a full field "EUV1" exposure tool from Nikon will be available by the end of 20071 and the pre-production EUV exposure tools from ASML are targeted for 20092. It is essential that high quality EUVL masks can be made and delivered to the EUVL tool users to support the technology development. In the past year, we have demonstrated mask fabrication with low stress absorber deposition and good etch process control yielding a vertical etch profile and a mask CD control of 5.7 nm for 32 nm (1x) space and 7.4 nm for 32 nm (1x) lines. Mask pattern resolution of 15 nm (1x) dense lines was achieved. Full field reflective mask die-to-die inspection at a 125nm pixel size was demonstrated after low defect multilayer blanks became available. In this paper, we will present details of the Intel EUVL Mask Pilot Line progress in EUVL mask defect reduction, pattern CD performance, program defect mask design and inspection, in-house absorber film development and its performance, and EUVL metrology tool development. We will demonstrate an overall improvement in EUV mask manufacturing readiness due to our Pilot Line activities.

  20. Application of CPL mask for whole chip 65nm DRAM patterning

    Science.gov (United States)

    Lin, Orson; Hung, Richard; Lee, Booky; Wu, Yuan-Hsun; Kozuma, Makoto; Shih, Chiang-Lin; Lin, Jengping; Hsu, Michael; Hsu, Stephen D.

    2005-06-01

    To extend the application of ArF exposure tool, CPL is one of the most powerful technologies for the resolution enhancement. From previous study, the 2nd level writing by E-Beam writer has been developed to ensure the manufacturability of CPL process. To fulfill the application of CPL Mask, we implemented this technology for 65nm DRAM patterning. First we studied the performance and characteristics of CPL mask with optimized exposure illumination setting for the desired pattern and dimension of 65nm DRAM. Then the mask data for CPL mask manufacture has been generated by modeled pattern decomposition approach together with rule and modeled OPC. This was accomplished by using an engine named MaskWeaver. For the manufacture of CPL mask, we used a binary mask and the Qz was etched for the 180 degrees phase difference. We utilized a 2nd level writing by an E-Beam writer to make the zebra pattern that was generated by the engine for the optimized patterning performance. The exposure tool we utilized for the verification of wafer patterning is an advanced 193nm exposure system. The process performance indexes such as MEEF, process window, CD uniformity were collected to show the capability of CPL process. Also, simulation and empirical data were compared to verify the performance of CPL technology. So by using an optimized CPL technology included mask data generation skill, mask making specifications, and ArF illumination optimization, we can meet the manufacture requirement of 65nm DRAM.

  1. Development of taste masked film of valdecoxib for oral use

    Directory of Open Access Journals (Sweden)

    Sharma Renuka

    2007-01-01

    Full Text Available The aim of the present investigation was to develop oral films of valdecoxib using Eudragit EPO and hydroxypropylmethylcellulose. Films of Eudragit EPO, hydroxypropylmethylcellulose and Eudragit EPO combined with hydroxypropylmethylcellulose were prepared by film casting method. Glycerol, menthol and aspartame were incorporated in the drug containing films as plasticizer, cooling agent and sweetener, respectively. The drug loading was 10 mg valdecoxib per 4 cm2 of the film. The films were evaluated for hydration study, folding endurance and in vitro drug dissolution in the distilled water. The films containing both Eudragit EPO and hydroxypropylmethylcellulose films showed neutral surface pH when prepared using 0.1 N HCl as a solvent. Glycerol played a critical role in imparting flexibility to the film and improving the drug release from film. The bitter taste of the drug was masked by using aspartame and menthol accompanied by the synergistic effect of Eudragit and glycerol. Water uptake by films was found to be dependant both on the amount of Eudragit EPO and glycerol. The films containing the higher proportion of glycerol showed higher water uptake and faster drug release at all the sampling time in the in vitro dissolution test. Optimum plasticity was obtained using the required concentration of hydroxypropylmethylcellulose and glycerol. The study revealed that taste masked valdecoxib films can be developed by the selection of appropriate film former and by the use of auxiliary excipients.

  2. Optimisation of microencapsulation of turmeric extract for masking flavour.

    Science.gov (United States)

    Laokuldilok, Natcha; Thakeow, Prodpran; Kopermsub, Phikunthong; Utama-ang, Niramon

    2016-03-01

    The aim of this study was to evaluate the odour masking property, encapsulation efficiency and physicochemical properties of turmeric extract prepared by a binary blend of wall materials, i.e. brown rice flour (BRF) and beta-cyclodextrin (β-CD). Response surface methodology was applied to investigate the effect of encapsulation processing variables, including core loading mass (5-25%) and β-CD (5-20%) concentration on product recovery, moisture content, hygroscopicity, curcuminoids encapsulation and volatile release. To investigate odour masking properties of a wall material combination, volatiles in headspace were monitored by GC-MS using ar-turmerone and 2-methyl-4-vinylguaiacol as marker compounds to represent turmeric extract. The obtained results revealed an optimal encapsulation process was 5% of core loading mass with addition 20g/L of β-CD, since it enabled high curcuminoids encapsulation with low volatile release, moisture content and hygroscopicity. Turmeric powder with reduced odour can be used as a nutrient supplement or natural colorant for food products.

  3. High Reading Skills Mask Dyslexia in Gifted Children.

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H; Slot, Esther M; de Bree, Elise H

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with dyslexia). The test battery included measures of literacy (reading/spelling) and cognitive abilities related to literacy and language (phonological awareness [PA], rapid automatized naming [RAN], verbal short-term memory [VSTM], working memory [WM], grammar, and vocabulary). It was hypothesized that gifted children with dyslexia would outperform children with dyslexia on literacy tests. In addition, a core-deficit model including dyslexia-related weaknesses and a compensational model involving giftedness-related strengths were tested using Bayesian statistics to explain their reading/spelling performance. Gifted children with dyslexia performed on all literacy tests in between children with dyslexia and TD children. Their cognitive profile showed signs of weaknesses in PA and RAN and strengths in VSTM, WM, and language skills. Findings indicate that phonology is a risk factor for gifted children with dyslexia, but this is moderated by other skills such as WM, grammar, and vocabulary, providing opportunities for compensation of a cognitive deficit and masking of literacy difficulties. © Hammill Institute on Disabilities 2014.

  4. Source mask optimization study based on latest Nikon immersion scanner

    Science.gov (United States)

    Zhu, Jun; Wei, Fang; Chen, Lijun; Zhang, Chenming; Zhang, Wei; Nishinaga, Hisashi; El-Sewefy, Omar; Gao, Gen-Sheng; Lafferty, Neal; Meiring, Jason; Zhang, Recoo; Zhu, Cynthia

    2016-03-01

    The 2x nm logic foundry node has many challenges since critical levels are pushed close to the limits of low k1 ArF water immersion lithography. For these levels, improvements in lithographic performance can translate to decreased rework and increased yield. Source Mask Optimization (SMO) is one such route to realize these image fidelity improvements. During SMO, critical layout constructs are intensively optimized in both the mask and source domain, resulting in a solution for maximum lithographic entitlement. From the hardware side, advances in source technology have enabled free-form illumination. The approach allows highly customized illumination, enabling the practical application of SMO sources. The customized illumination sources can be adjusted for maximum versatility. In this paper, we present a study on a critical layer of an advanced foundry logic node using the latest ILT based SMO software, paired with state-of-the-art scanner hardware and intelligent illuminator. Performance of the layer's existing POR source is compared with the ideal SMO result and the installed source as realized on the intelligent illuminator of an NSR-S630D scanner. Both simulation and on-silicon measurements are used to confirm that the performance of the studied layer meets established specifications.

  5. Phase-dependent audiometry with low-frequency masking revisited.

    Science.gov (United States)

    Rahne, Torsten; Rasinski, Christine; Neumann, Kerstin

    2010-05-15

    Low-frequency masking is a psychoacoustical phenomenon, describing the modulation of a high-frequency probe tone burst by a low-frequency masker tone. The probe tone threshold is increased, if the probe tone is presented at a low-frequency phases around 90 degrees and 270 degrees . At these phases, the low-frequency masker tone induces a displacement of the basilar membrane of the inner ear which modulates the sensitivity of the inner hair cells. Measuring the modulation depth is partially applied in clinical routine to diagnose the endolymphatic hydrops. Although the modulation depth differs between normal ears and those which reveal an endolymphatic hydrops, the significance of these tests seems debatable. Here, we describe a new experimental setup, completely consisting of commercially available devices. Further, a user interface was developed to enable the application in the clinical routine. The experimental setup was approved with ten normal hearing listeners. All reveal a modulation of the probe stimulus threshold by different phases of the low-frequency masker stimulus. With this experimental setup, custom-made modifications of the essential parameters are feasible. This would be a contribution to solve open questions on the clinical relevance of the low-frequency masking phenomenon.

  6. Manufacturability evaluation of model-based OPC masks

    Science.gov (United States)

    Jang, Sung-Hoon; Zinn, Sonny Y.; Ki, Won-Tai; Choi, Ji-Hyun; Jeon, Chan-Uk; Choi, Seong-Woon; Yoon, Hee-Sun; Sohn, Jung-Min; Oh, Yong-Ho; Lee, Jai-Cheol; Lim, Sungwoo

    2002-12-01

    A systematic method for the model-based optical proximity correction in presented. This is called optical proximity effect reducing algorithm (OPERA) and has been implemented to TOPO, an in-house program for optical lithography simulations. Comparing simulational results as well as experimental results, we found that OPERA is not only suitable for shape restoration but also for resolution enhancement. However, the resulting optimized patterns have a high degree of complexity and this brought up a number of issues for mask manufacturing. First, data volume and exposure time were dramatically increased for conventional e-beam file formats. This was solved by using the MODE6 format that preserves data hierarchy. Second, due to excessive shot divisions, a variable-shaped beam machine could not finish the exposure process. A raster-scan beam machine successfully finished the exposure. Finally, a die-to-die inspection was performed but many false defects that do not affect wafer printing were defected. This will be solved by a new type of tool that inspects a mask by evaluating its aerial image.

  7. Blind speech source separation via nonlinear time-frequency masking

    Institute of Scientific and Technical Information of China (English)

    XU Shun; CHEN Shaorong; LIU Yulin

    2008-01-01

    Aim at the underdetermined convolutive mixture model, a blind speech source separation method based on nonlinear time-frequency masking was proposed, where the approximate W-disjoint orthogonality (W-DO) property among independent speech signals in time-frequency domain is utilized. In this method, the observation mixture signal from multimicrophones is normalized to be independent of frequency in the time-frequency domain at first, then the dynamic clustering algorithm is adopted to obtain the active source information in each time-frequency slot, a nonlinear function via deflection angle from the cluster center is selected for time-frequency masking, finally the blind separation of mixture speech signals can be achieved by inverse STFT (short-time Fourier transformation). This method can not only solve the problem of frequency permutation which may be met in most classic frequency-domain blind separation techniques, but also suppress the spatial direction diffusion of the separation matrix. The simulation results demonstrate that the proposed separation method is better than the typical BLUES method, the signal-noise-ratio gain (SNRG) increases 1.58 dB averagely.

  8. Optimal Phase Masks for High Contrast Imaging Applications

    Science.gov (United States)

    Ruane, Garreth J.

    2016-05-01

    Phase-only optical elements can provide a number of important functions for high-contrast imaging. This thesis presents analytical and numerical optical design methods for accomplishing specific tasks, the most significant of which is the precise suppression of light from a distant point source. Instruments designed for this purpose are known as coronagraphs. Here, advanced coronagraph designs are presented that offer improved theoretical performance in comparison to the current state-of-the-art. Applications of these systems include the direct imaging and characterization of exoplanets and circumstellar disks with high sensitivity. Several new coronagraph designs are introduced and, in some cases, experimental support is provided. In addition, two novel high-contrast imaging applications are discussed: the measurement of sub-resolution information using coronagraphic optics and the protection of sensors from laser damage. The former is based on experimental measurements of the sensitivity of a coronagraph to source displacement. The latter discussion presents the current state of ongoing theoretical work. Beyond the mentioned applications, the main outcome of this thesis is a generalized theory for the design of optical systems with one of more phase masks that provide precise control of radiation over a large dynamic range, which is relevant in various high-contrast imaging scenarios. The optimal phase masks depend on the necessary tasks, the maximum number of optics, and application specific performance measures. The challenges and future prospects of this work are discussed in detail.

  9. Development of a Taste-Masked Orodispersible Film Containing Dimenhydrinate

    Directory of Open Access Journals (Sweden)

    Jörg Breitkreutz

    2012-10-01

    Full Text Available Orodispersible dosage forms are promising new approaches for drug delivery. They enable an easy application, as there is no need to drink high amounts of liquids or swallow large solid dosage forms. The aim of the study was to develop an orodispersible film (ODF as an alternative to tablets, syrups or suppositories for the treatment of vomiting and nausea, especially for the pediatric population. Formulations were investigated by X-ray diffraction, scanning electron and polarized light microscopy. Additionally, two commercially available electronic taste sensing systems were used to investigate the applied taste-masking strategies. Results obtained from X-ray-diffraction and polarized light microscopy showed no recrystallization of dimenhydrinate in the formulation when cyclodextrin or maltodextrin were used as solubilizing and complexing agent. All ODFs showed fast disintegration depending on the characterization method. In order to get taste information, the dimenhydrinate formulations were analytically compared to pure drug and drug-free formulations by electronic tongues. Results obtained from both systems are comparable and were used together for the first time. It was possible to develop an ODF of dimenhydrinate that is fast disintegrating even in small volumes of liquid. Furthermore, in vitro taste assessment by two electronic tongues revealed taste-masking effects by the excipients.

  10. The narcissistic mask: an exploration of 'the defensive grandiosity hypothesis'.

    Science.gov (United States)

    Thomas, Justin; Hashmi, Amani Al; Chung, Man Cheung; Morgan, Keith; Lyons, Minna

    2013-05-01

    Narcissism has been conceptualized as involving attempts to defend against negative self-schemata (implicit negative beliefs about one's own self-worth). This idea has been termed the 'mask model of narcissism'. This study explores the mask model, examining the association between extreme narcissistic personality traits and performance on a task purported to assess the influence of negative self-schemata. Participants (n = 232) from the UK and the UAE completed the Narcissistic Personality Inventory and also performed an incidental learning task involving the surprise recall of self-referential adjectives (traits). A greater recall of negative adjectives was viewed as indicative of negative self-schemata. Looking at the sample as a whole, there were no associations between narcissistic traits and negative adjective recall. However, amongst those scoring in the upper quartile of the Narcissistic Personality Inventory, narcissism scores were positively correlated with the recall of negative adjectives even after controlling for age and memory. Narcissism may reflect self-enhancement strategies rooted in negative self-beliefs.

  11. Unmasking the dichoptic mask by sound: spatial congruency matters.

    Science.gov (United States)

    Yang, Yung-Hao; Yeh, Su-Ling

    2014-04-01

    People tend to look toward where a sound occurs; however, the role of spatial congruency between sound and sight in the effect of sound facilitation on visual detection remains controversial. We propose that the role of spatial congruency depends on the reliability of the information provided by the facilitator; if it is relatively unreliable, adding spatially congruent information can help to unify different sensory inputs to compensate for this unreliability. To test this, we examine the influence of sound location on visual detection with a non-temporal task, presumably unfavorable for sound since it is better for temporal resolution, and predict that spatial congruency should matter in this situation. We used the continuous flash suppression paradigm that makes the visual stimuli invisible to keep the relationship of sound and sight opaque. The sound is on the same depth plane as the visual stimulus (the congruent condition) or on a different plane (the incongruent condition). The target was presented to one eye with luminance contrast gradually increased and continuously masked by flashed Mondrian masks presented to the other eye until the target was released from suppression. We found that sound facilitated visual detection (measured by released-from-suppression time) in the spatially congruent condition but not in the spatially incongruent condition. Together with previous findings in the literature, it is suggested that both task type and modality determine the reliability of the information for multisensory integration and thus determine whether spatial congruency is critical.

  12. Face mask ventilation: a comparison of three techniques.

    Science.gov (United States)

    Hart, Danielle; Reardon, Robert; Ward, Christopher; Miner, James

    2013-05-01

    There are multiple techniques for face-mask (FM) ventilation. To our knowledge, the one-handed vs. two-handed C-E technique has been compared in children and adults, but no studies have compared the various two-handed methods. To compare the effectiveness of mask seal using three different FM techniques on a model intended to simulate difficult FM ventilation and measure ventilation performance. This was a prospective randomized study of health care providers. A standard airway-training mannequin was modified to produce variable airway resistance and allow measurements of ventilation volume and pressure. Each subject performed FM ventilation for 3 min per technique (30 breaths) in a randomized order. Median exhaled tidal volume and proximal peak flow pressure were determined and compared. Seventy subjects were enrolled. Both two-handed ventilation techniques were more effective than the one-handed technique by both volume and pressure measurements. The one-handed C-E technique yielded a median volume of 428.4 mL, vs. the two-handed C-E technique with 550.8 mL, and the two-handed V-E technique with 538 mL (p training for health care providers. Copyright © 2013 Elsevier Inc. All rights reserved.

  13. Master masks for big patterns by electron-beam lithography

    Science.gov (United States)

    Zlobin, Vladimir A.; Mamonov, V. I.; Vasiljeva, Olga G.

    1995-05-01

    Modern technologies for power semiconductor devices, laser and micro optics, micromechanics requires microlithography of patterns having a large are up to 100 cm2 with complicate precise drawing. The electron beam lithography (EBL) tools with variable shape beam have good prospects for this purpose, but their application has a few problems in case of the tasks pointed above. The main problems are a great volume of information and a large exposure time of such patterns. We propose the system for preparation of the exposure data having more than 100 MB volume that consists from set of personal computers, network adapters, and software. The preparation of graphic information and exposure strategy are presented. The optimum exposure conditions are determined by program modeling the exposure process in dependence on the statistic distribution of sizes of EBL figures. Our method permits to decrease the exposure time in several times under certain conditions and brings that nearer to theoretical limit Tmin equals SD/IBmax, where Tmin is minimum exposure time, S is exposure area, D is dose density, IBmax is maximum beam current. This approach is valid if the basic factor limiting the writing speed is IBmax. The developed computer system and writing strategy was applied us for mask making on modified ZBA-21 tool. These masks were meant for production of power semiconductor and laser optics devices.

  14. Difficult mask ventilation in obese patients: analysis of predictive factors.

    Science.gov (United States)

    Leoni, A; Arlati, S; Ghisi, D; Verwej, M; Lugani, D; Ghisi, P; Cappelleri, G; Cedrati, V; El Tantawi Ali Alsheraei, A; Pocar, M; Ceriani, V; Aldegheri, G

    2014-02-01

    This study aimed to determine the accuracy of commonly used preoperative difficult airway indices as predictors of difficult mask ventilation (DMV) in obese patients (BMI >30 kg/m2). In 309 consecutive obese patients undergoing general surgery, the modified Mallampati test, patient's Height/Thyromental distance ratio, Inter-Incisor Distance, Protruding Mandible (PM), history of Obstructive Sleep Apnea and Neck Circumference (NC) were recorded preoperatively. DMV was defined as Grade 3 mask ventilation (MV) by the Han's scale (MV inadequate, unstable or requiring two practitioners). Data are shown as means±SD or number and proportions. Independent DMV predictors were identified by multivariate analysis. The discriminating capacity of the model (ROC curve area) and adjusted weights for the risk factors (odds ratios) were also determined. BMI averaged 42.5±8.3 kg/m2. DMV was reported in 27 out of 309 patients (8.8%; 95%CI 5.6-11.9%). The multivariate analysis retained NC (OR 1.17; P2 associated factors as the best discriminating point for DMV. Obese patients show increased incidence of DMV with respect to the undifferentiated surgical population. Limited PM, Mallampati test and NC are important DMV predictors.

  15. Ergonomic risks in mask manufacturing and methods to combat them

    Science.gov (United States)

    Gardner, Larry; Strott, Al

    1995-12-01

    A growing concern throughout the world is the increasing occurrence of cumulative trauma disorders (CTDs) or repetitive motion injuries. Countries worldwide are struggling over the correct way to respond to the legal aspects of the problem, given the difficulty of root cause identification of the injury. The mask industry is no exception to this. Some companies may not be aware of the problem. Some companies may be aware, but not concerned. The reality is, however, that the problem exists and should not be ignored. Eventually, regulatory agencies such as OSHA, will take a position or stance on recognition of this as an injury status making it impossible to ignore. Companies who have not been proactive in the prevention of ergonomic injuries may find themselves in a crisis reactive mode that may cost them thousands of unplanned dollars. In this paper, we expand on the awareness of CTDs as a growing problem. We also share the actions that Intel is taking to address this problem. It is the authors' hope that the awareness and sharing presented in this paper will result in the sharing of experiences among the mask suppliers, so that we can all be successful in addressing this challenging issue.

  16. Inspection system qualification and integration into the mask manufacturing environment

    Science.gov (United States)

    LaVoy, Rosanne; Fujioka, Ron

    1995-12-01

    Integration of a mask inspection system into a manufacturing environment poses new challenges to both the inspection engineer and the equipment supplier. Traditional specifications (limited primarily to sensitivity and uptime) are no longer sufficient to successfully integrate a system into a 7 by 24 manufacturing area with multiple systems. Issues such as system sensitivity matching, sensitivity characterization by defect type, operator training and certification standards, and real-time SPC control of the systems must be addressed. This paper outlines some of the techniques Intel Mask Operation uses for integration of a new inspection system into the manufacturing line. Specifically moving a beta- site type tool out of the beta-site mode and into volume production. Examples are presented, including installation for manufacturing (including ergonomic modifications), techniques for system-to-system matching, use of SPC charts to monitor system performance, and operator training/certifications. Relationships between system PMs, or other environmental changes, and the system sensitivity SPC control charts also are discussed.

  17. Contribution of supra-threshold processing to speech masking release

    DEFF Research Database (Denmark)

    Christiansen, Claus Forup Corlin; Dau, Torsten

    2011-01-01

    Normal-hearing (NH) listeners can typically better understand speech in the presence of a fluctuating noise or a competing talker compared to a stationary noise interferer. However, for hearing-impaired (HI) listeners, this masking release (MR) is strongly reduced or completely absent. Traditiona......Normal-hearing (NH) listeners can typically better understand speech in the presence of a fluctuating noise or a competing talker compared to a stationary noise interferer. However, for hearing-impaired (HI) listeners, this masking release (MR) is strongly reduced or completely absent....... Traditionally, this has been attributed to the ability of NH listeners to utilize the speech in the low-amplitude periods of the masker, an ability that is supposed to be reduced for HI listeners due to reduced temporal and spectral resolution. However, [1] proposed that the reduced MR experienced by HI...... listeners is due to their higher speech reception threshold (SRT) in stationary noise. In the present study, this hypothesis was investigated by presenting noise-band vocoded as well as low-pass and high-pass filtered stimuli to the NH listeners. In this way, the SRTs of the NH listeners were similar...

  18. A nanohybrid system for taste masking of sildenafil

    Directory of Open Access Journals (Sweden)

    Lee JH

    2012-03-01

    Full Text Available Ji-Hee Lee1,*, Goeun Choi1,*, Yeon-Ji Oh1, Je Won Park1, Young Bin Choy3, Mung Chul Park1, Yeo Joon Yoon1, Hwa Jeong Lee2, Hee Chul Chang4, Jin-Ho Choy1 1Center for Intelligent Nano-Bio Materials (CINBM, Department of Bioinspired Science and Department of Chemistry and Nano Science, 2Division of Life and Pharmaceutical Sciences and College of Pharmacy, Ewha Womans University, Seoul, Korea; 3Department of Biomedical Engineering, College of Medicine and Institute of Medical and Biological Engineering, Medical Research Center, Seoul National University, Seoul, Korea; 4Global Strategy Center and Pharmaceutical Research Institute, Daewoong Pharmaceutical Co., Ltd., Seoul, Korea*These authors contributed equally to this workAbstract: A nanohybrid was prepared with an inorganic clay material, montmorillonite (MMT, for taste masking of sildenafil (SDN. To further improve the taste-masking efficiency and enhance the drug-release rate, we coated the nanohybrid of SDN–MMT with a basic polymer, polyvinylacetal diethylaminoacetate (AEA. Powder X-ray diffraction and Fourier transform infrared experiments showed that SDN was successfully intercalated into the interlayer space of MMT. The AEA-coated SDN–MMT nanohybrid showed drug release was much suppressed at neutral pH (release rate, 4.70 ± 0.53%, suggesting a potential for drug taste masking at the buccal cavity. We also performed in vitro drug release experiments in a simulated gastric fluid (pH = 1.2 and compared the drug-release profiles of AEA-coated SDN–MMT and Viagra®, an approved dosage form of SDN. As a result, about 90% of SDN was released from the AEA-coated SDN–MMT during the first 2 hours while almost 100% of drug was released from Viagra®. However, an in vivo experiment showed that the AEA-coated SDN–MMT exhibited higher drug exposure than Viagra®. For the AEA-coated SDN–MMT, the area under the plasma concentration–time curve from 0 hours to infinity (AUC0-∞ and maximum

  19. Roughening of Polyimide Surface for Inkjet Printing by Plasma Etching Using the Polyimide Masked with Polystyrene Nanosphere Array.

    Science.gov (United States)

    Mun, Mu Kyeom; Park, Jin Woo; Ahn, Jin Ho; Kim, Ki Kang; Yeom, Geun Young

    2015-10-01

    Two key conditions are required for the application of fine-line inkjet printing onto a flexible substrate such as polyimide (PI): linewidth control during the inkjetting process, and a strong adhesion of the polyimide surface to the ink after the ink solidifies. In this study, the properties of a polyimide surface that was roughened through etching in a He/SF6 plasma, using a polystyrene nanosphere array as the etch mask, were investigated. The near-atmospheric-pressure plasma system of the He/SF6 plasma that was used exhibits two notable properties in this context: similar to an atmospheric-pressure plasma system, it can easily handle inline substrate processing; and, similar to a vacuum system, it can control the process gas environment. Through the use of plasma etching, the polyimide surface masked the 120-nm-diameter polystyrene nanospheres, thereby forming a roughened nanoscale polyimide surface. This surface exhibited not only a greater hydrophobicity--with a contact angle of about 150° for water and about 30° for silver ink, indicating better silver linewidth control during the silver inkjetting process--but also a stronger adhesion to the silver ink sprayed onto it when compared with the flat polyimide surface.

  20. Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy

    Science.gov (United States)

    Chen, Yulu; Wood, Obert; Rankin, Jed; Gullikson, Eric; Meyer-Ilse, Julia; Sun, Lei; Qi, Zhengqing John; Goodwin, Francis; Kye, Jongwook

    2017-03-01

    Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that provide enhanced reflectivity over a narrow wavelength band peaked at the Bragg wavelength.1 Absorber side wall angle, corner rounding,2 surface roughness,3 and defects4 affect mask performance, but even seemingly simple parameters like bulk reflectivity on mirror and absorber surfaces can have a profound influence on imaging. For instance, using inaccurate reflectivity values at small and large incident angles would diminish the benefits of source mask co-optimization (SMO) and result in larger than expected pattern shifts. The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.

  1. Mask CD uniformity improvement by electron scanning exposure based Global Loading Effect Correction

    Science.gov (United States)

    Li, Rivan; Tian, Eric; Shi, Irene; Guo, Eric; Lu, Max

    2015-07-01

    Critical Dimension (CD) Uniformity is one of the necessary parameters to assure good performance and reliable functionality of any integrated circuit (IC), and towards the advanced technology node 28nm and beyond, corresponding CD Uniformity becomes more and more crucial. It is found that bad mask CD Uniformity is a significant error source at 28nm process. The CD Uniformity on mask, if not controlled well, will badly impact wafer CD performance, and it has been well-studied that CD Uniformity issue from gate line-width in transistors would affect the device performance directly. In this paper we present a novel solution for mask global CD uniformity error correction, which is called as global loading effect correction (GLEC) method and applied nesting in the mask exposure map during the electron beam exposure. There are factors such as global chip layout, writing sequence and chip pattern density distribution (Global Loading), that work on the whole mask CD Uniformity, especially Global Loading is the key factor related to mask global CD error. From our experimental results, different pattern density distribution on mask significantly influenced the final mask CD Uniformity: the mask with undulating pattern density distribution provides much worse CD Uniformity than that with uniform one. Therefore, a GLEC model based on pattern density has been created to compensate the global error during the electron beam exposure, which has been proved to be efficacious to improve mask global CD Uniformity performance. Furthermore, it 's also revealed that pattern type is another important impact factor, and GLEC coefficient need be modified due to the specific pattern type (e.g. dense line-space only, iso-space only or an average of them) to improve the corresponding mask CD uniformity.

  2. Method for validating cloud mask obtained from satellite measurements using ground-based sky camera.

    Science.gov (United States)

    Letu, Husi; Nagao, Takashi M; Nakajima, Takashi Y; Matsumae, Yoshiaki

    2014-11-01

    Error propagation in Earth's atmospheric, oceanic, and land surface parameters of the satellite products caused by misclassification of the cloud mask is a critical issue for improving the accuracy of satellite products. Thus, characterizing the accuracy of the cloud mask is important for investigating the influence of the cloud mask on satellite products. In this study, we proposed a method for validating multiwavelength satellite data derived cloud masks using ground-based sky camera (GSC) data. First, a cloud cover algorithm for GSC data has been developed using sky index and bright index. Then, Moderate Resolution Imaging Spectroradiometer (MODIS) satellite data derived cloud masks by two cloud-screening algorithms (i.e., MOD35 and CLAUDIA) were validated using the GSC cloud mask. The results indicate that MOD35 is likely to classify ambiguous pixels as "cloudy," whereas CLAUDIA is likely to classify them as "clear." Furthermore, the influence of error propagations caused by misclassification of the MOD35 and CLAUDIA cloud masks on MODIS derived reflectance, brightness temperature, and normalized difference vegetation index (NDVI) in clear and cloudy pixels was investigated using sky camera data. It shows that the influence of the error propagation by the MOD35 cloud mask on the MODIS derived monthly mean reflectance, brightness temperature, and NDVI for clear pixels is significantly smaller than for the CLAUDIA cloud mask; the influence of the error propagation by the CLAUDIA cloud mask on MODIS derived monthly mean cloud products for cloudy pixels is significantly smaller than that by the MOD35 cloud mask.

  3. Impact of mask CDU and local CD variation on intra-field CDU

    Science.gov (United States)

    Miyazaki, Junji; Mouraille, Orion; Finders, Jo; Higuchi, Masaru; Kojima, Yosuke; Sato, Shunsuke; Morimoto, Hiroaki

    2012-11-01

    The control of critical dimension uniformity (CDU), especially intra-field CDU, is an important aspect for advanced lithography, and this property must be controlled very tightly since it affects all of the exposure fields. It is well known that the influence of the mask CDU on the wafer intra-field CDU is becoming dominant because the mask error enhancement factor (MEEF) is quite high for low-k1 lithography. Additionally, the abovementioned factors impact the CDU through global (field-level) and local (grating-level) variations. In this paper, we analyze in detail CDU budgets by clarifying the impact of local CD variation. The 50-nm staggered hole features using Att-PSM showed a mask global CDU of 1.64 nm (3sigma at the mask level) and a wafer intra-field CDU of 2.30 nm, indicating that the mask global CDU was a major part of the intra-field CDU. By compensating for the contribution of the mask CD, the wafer intra-field CDU can be reduced to 0.986 nm. We analyzed the budgets of wafer intra-field CDU, which is caused by local CD variation (mask and process) and measurement noise. We determined that a primary cause of the wafer intra-field CDU after applying a mask CD correction was these local CD variations, which might disturb the proper use of dose correction for the mask CD. We demonstrated that the impact of mask local CD variation on the correction flow can be greatly reduced by averaging multiple point measurements within a small area, and therefore discuss the optimum conditions allowing for an accurate intra-field CDU determination. We also consider optimization of the CD sampling scheme in order to apply a dose correction on an exposure system to compensate for the mask CDU.

  4. A laboratory experiment for a new free-standing pupil mask coronagraph

    Science.gov (United States)

    Haze, K.; Enya, K.; Kotani, T.; Abe, L.; Nakagawa, T.; Matsuhara, H.; Sato, T.; Yamamuro, T.

    2012-09-01

    This paper presents the results of a laboratory experiment on a new free-standing pupil mask coronagraph for the direct observation of exoplanets. We focused on a binary-shaped pupil coronagraph, which is planned for installation in the next-generation infrared space telescope SPICA. Our laboratory experiments on the coronagraph were implemented inside a vacuum chamber (HOCT) to achieve greater thermal stability and to avoid air turbulence, and a contrast of 1.3×10-9 was achieved with PSF subtraction. We also carried out multi-color/broadband experiments to demonstrate that the pupil mask coronagraph works, in principle, at all wavelengths. We had previously manufactured a checker-board mask, a type of binary-shaped pupil mask, on a glass substrate, which had the disadvantages of light loss by transmission, ghosting from residual reflectance and a slightly different refractive index for each wavelength. Therefore, we developed a new free-standing mask in sheet metal, for which no substrate was needed. As a result of a He-Ne laser experiment with the free-standing mask, a contrast of 1.0×10-7 was achieved for the raw coronagraphic image. We also conducted rotated mask subtractions and numerical simulations of some errors in the mask shape and WFEs. Speckles are the major limiting factor. The free-standing mask exhibited about the same ability to improve contrast as the substrate mask. Consequently, the results of this study suggest that the binary-shaped pupil mask coronagraph can be applied to coronagraphic observations by SPICA and other telescopes.

  5. Fit factors for quarter masks and facial size categories.

    Science.gov (United States)

    Han, D H

    2000-05-01

    Respirator fit testing is necessary before entering hazardous working environments to ensure that the respirator, when worn, satisfies a minimum fit and that the wearer knows when the respirator fits properly. In the many countries that do not have fit testing or total inward leakage regulations (including Korea), however, many workers wearing respirators may be potentially exposed to hazardous environments. It is necessary to suggest a useful tool to provide an alternative for fit testing in these countries. This study was conducted to evaluate fitting performance for quarter-mask respirators, and fit factors in facial size categories based on face lengths and lip lengths of the wearers. A total of 778 subjects (408 males, 370 females) were fit tested for three quarter masks: Sejin Co. SK-6 (Ulsan, Korea), Yongsung Co. YS-2010 S (Seoul, Korea), and 3 M Co. Series 7500 Medium (MN, USA) masks with a PortaCount 8020 (TSI Co., USA). A facial dimension survey of the subjects was conducted to develop facial size categories, on the basis of face length and lip length. Geometric mean fit factors (GMFFs) of Series 7500 Medium were found to be the highest of the three respirators. All of the respirators were more suitable for males than females in fitting performance. The Series 7500 Medium fitted a large number of the males tested, since the GMFFs for males were above 100 for every box of facial size categories, and high pass proportion rates were shown at an individual fit factor level of 100. The YS-2010 S provides an adequate fit for males in a limited range of facial dimensions. The Series 7500 Medium is more limited in providing adequate fit for females at specific facial dimensions than for males. For adequate fitting performance, the SK-6 is not preferentially recommended for Korean male and female workers due to low GMFFs and pass proportions. The result of this study indicates that after more accurate studies are performed, facial size categories, on the basis of

  6. Improving the privacy of optical steganography with temporal phase masks.

    Science.gov (United States)

    Wang, Z; Fok, M P; Xu, L; Chang, J; Prucnal, P R

    2010-03-15

    Temporal phase modulation of spread stealth signals is proposed and demonstrated to improve optical steganography transmission privacy. After phase modulation, the temporally spread stealth signal has a more complex spectral-phase-temporal relationship, such that the original temporal profile cannot be restored when only dispersion compensation is applied to the temporally spread stealth signals. Therefore, it increases the difficulty for the eavesdropper to detect and intercept the stealth channel that is hidden under a public transmission, even with a correct dispersion compensation device. The experimental results demonstrate the feasibility of this approach and display insignificant degradation in transmission performance, compared to the conventional stealth transmission without temporal phase modulation. The proposed system can also work without a clock transmission for signal synchronization. Our analysis and simulation results show that it is difficult for the adversary to detect the existence of the stealth transmission, or find the correct phase mask to recover the stealth signals.

  7. Robust watermark technique using masking and Hermite transform.

    Science.gov (United States)

    Coronel, Sandra L Gomez; Ramírez, Boris Escalante; Mosqueda, Marco A Acevedo

    2016-01-01

    The following paper evaluates a watermark algorithm designed for digital images by using a perceptive mask and a normalization process, thus preventing human eye detection, as well as ensuring its robustness against common processing and geometric attacks. The Hermite transform is employed because it allows a perfect reconstruction of the image, while incorporating human visual system properties; moreover, it is based on the Gaussian functions derivates. The applied watermark represents information of the digital image proprietor. The extraction process is blind, because it does not require the original image. The following techniques were utilized in the evaluation of the algorithm: peak signal-to-noise ratio, the structural similarity index average, the normalized crossed correlation, and bit error rate. Several watermark extraction tests were performed, with against geometric and common processing attacks. It allowed us to identify how many bits in the watermark can be modified for its adequate extraction.

  8. Hypothyroidism due to Hashimoto's thyroiditis masked by anorexia nervosa.

    Science.gov (United States)

    Smalls-Mantey, Adjoa; Steinglass, Joanna; Primack, Marshall; Clark-Hamilton, Jill; Bongiovi, Mary

    2015-11-01

    Anorexia nervosa (AN) is typically associated with altered thyroid function tests, notably a low total and free T3 , and lower, but within normal range, free T4 and TSH. A 16-year-old girl with a four-year history of AN presented with elevated TSH that fluctuated with changes in weight. TSH was within normal limits (1.7-3.64 mIU/L) following periods of weight loss and elevated with weight gain (5.9-21.66 mIU/L). Antithyroperoxidase antibodies were markedly elevated, suggesting chronic Hashimoto's thyroiditis. Of note, the elevated TSH that would be expected in Hashimoto's thyroiditis was blunted by weight loss associated with AN. Physicians should be aware that AN may contribute to masking thyroid abnormalities in Hashimoto's thyroiditis.

  9. Prospects for electron beam aberration correction using sculpted phase masks.

    Science.gov (United States)

    Shiloh, Roy; Remez, Roei; Arie, Ady

    2016-04-01

    Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20-30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration. Copyright © 2016 Elsevier B.V. All rights reserved.

  10. Prospects for electron beam aberration correction using sculpted phase masks

    Energy Technology Data Exchange (ETDEWEB)

    Shiloh, Roy, E-mail: royshilo@post.tau.ac.il; Remez, Roei; Arie, Ady

    2016-04-15

    Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20–30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration. - Highlights: • Thin membranes can be used as aberration correctors in electron columns. • We demonstrate tilt, twofold-, threefold-astigmatism, and spherical aberrations. • Experimental and physical-optics simulation results are in good agreement. • Advantages in cost, size, nonmagnetism, and nearly-arbitrary correction.

  11. Laryngeal mask airway (LMA) artefact resulting in MRI misdiagnosis

    Energy Technology Data Exchange (ETDEWEB)

    Schieble, Thomas [University of Medicine and Dentistry of New Jersey, Department of Anesthesiology, New Jersey Medical School, Newark, NJ (United States); Maimonides Medical Center, Department of Anesthesiology, Brooklyn, NY (United States); Patel, Anuradha; Davidson, Melissa [University of Medicine and Dentistry of New Jersey, Department of Anesthesiology, New Jersey Medical School, Newark, NJ (United States)

    2008-03-15

    We report a 7-year-old child who underwent brain MRI for a known seizure disorder. The technique used for general anesthesia included inhalation induction followed by placement of a laryngeal mask airway (LMA) for airway maintenance. Because the reviewing radiologist was unfamiliar with the use of an LMA during anesthesia, and because the attending anesthesiologist did not communicate his technique to the radiologist, an MRI misdiagnosis was reported because of artefact created by the in situ LMA. As a result of this misdiagnosis the child was subjected to unnecessary subsequent testing to rule out a reported anatomic abnormality induced by the LMA. Our case illustrates the need for coordination of patient care among hospital services. (orig.)

  12. Extra Solar Planet Science With a Non Redundant Mask

    Science.gov (United States)

    Minto, Stefenie Nicolet; Sivaramakrishnan, Anand; Greenbaum, Alexandra; St. Laurent, Kathryn; Thatte, Deeparshi

    2017-01-01

    To detect faint planetary companions near a much brighter star, at the Resolution Limit of the James Webb Space Telescope (JWST) the Near-Infrared Imager and Slitless Spectrograph (NIRISS) will use a non-redundant aperture mask (NRM) for high contrast imaging. I simulated NIRISS data of stars with and without planets, and run these through the code that measures interferometric image properties to determine how sensitive planetary detection is to our knowledge of instrumental parameters, starting with the pixel scale. I measured the position angle, distance, and contrast ratio of the planet (with respect to the star) to characterize the binary pair. To organize this data I am creating programs that will automatically and systematically explore multi-dimensional instrument parameter spaces and binary characteristics. In the future my code will also be applied to explore any other parameters we can simulate.

  13. Class III treatment using facial mask: Stability after 10 years

    Directory of Open Access Journals (Sweden)

    Adilson Luiz Ramos

    2014-10-01

    Full Text Available Early Class III malocclusion treatment may not have long-term stability due to mandibular growth. Although some features of this malocclusion point to a better prognosis, it is practically impossible for the orthodontist to foresee cases that require new intervention. Many patients need retreatment, whether compensatory or orthodontic-surgical. The present study reports the case of a Class III patient treated at the end of the mixed dentition with the use of a face mask followed by conventional fixed appliances. The case remains stable 10 years after treatment completion. It was presented to the Brazilian Board of Orthodontics and Dentofacial Orthopedics (BBO as a requirement for the title of certified by the BBO.

  14. Binaural masking release in children with Down syndrome.

    Science.gov (United States)

    Porter, Heather L; Grantham, D Wesley; Ashmead, Daniel H; Tharpe, Anne Marie

    2014-01-01

    Binaural hearing results in a number of listening advantages relative to monaural hearing, including enhanced hearing sensitivity and better speech understanding in adverse listening conditions. These advantages are facilitated in part by the ability to detect and use interaural cues within the central auditory system. Binaural hearing for children with Down syndrome could be impacted by multiple factors including, structural anomalies within the peripheral and central auditory system, alterations in synaptic communication, and chronic otitis media with effusion. However, binaural hearing capabilities have not been investigated in these children. This study tested the hypothesis that children with Down syndrome experience less binaural benefit than typically developing peers. Participants included children with Down syndrome aged 6 to 16 years (n = 11), typically developing children aged 3 to 12 years (n = 46), adults with Down syndrome (n = 3), and adults with no known neurological delays (n = 6). Inclusionary criteria included normal to near-normal hearing sensitivity. Two tasks were used to assess binaural ability. Masking level difference (MLD) was calculated by comparing threshold for a 500-Hz pure-tone signal in 300-Hz wide Gaussian noise for N0S0 and N0Sπ signal configurations. Binaural intelligibility level difference was calculated using simulated free-field conditions. Speech recognition threshold was measured for closed-set spondees presented from 0-degree azimuth in speech-shaped noise presented from 0-, 45- and 90-degree azimuth, respectively. The developmental ability of children with Down syndrome was estimated and information regarding history of otitis media was obtained for all child participants via parent survey. Individuals with Down syndrome had higher masked thresholds for pure-tone and speech stimuli than typically developing individuals. Children with Down syndrome had significantly smaller MLDs than typically developing children. Adults

  15. Systematic study of source mask optimization and verification flows

    Science.gov (United States)

    Ben, Yu; Latypov, Azat; Chua, Gek Soon; Zou, Yi

    2012-06-01

    Source mask optimization (SMO) emerged as powerful resolution enhancement technique (RET) for advanced technology nodes. However, there is a plethora of flow and verification metrics in the field, confounding the end user of the technique. Systemic study of different flows and the possible unification thereof is missing. This contribution is intended to reveal the pros and cons of different SMO approaches and verification metrics, understand the commonality and difference, and provide a generic guideline for RET selection via SMO. The paper discusses 3 different type of variations commonly arise in SMO, namely pattern preparation & selection, availability of relevant OPC recipe for freeform source and finally the metrics used in source verification. Several pattern selection algorithms are compared and advantages of systematic pattern selection algorithms are discussed. In the absence of a full resist model for SMO, alternative SMO flow without full resist model is reviewed. Preferred verification flow with quality metrics of DOF and MEEF is examined.

  16. Optical Synchrotron Radiation Beam Imaging with a Digital Mask

    Energy Technology Data Exchange (ETDEWEB)

    Fiorito, R. B. [University of Maryland, College Park, MD (United States); Zhang, H. D. [University of Maryland, College Park, MD (United States); Corbett, W. J. [SLAC, Menlo Park, CA (United States); Fisher, A. S. [SLAC, Menlo Park, CA (United States); Mok, W. Y. [SLAC, Menlo Park, CA (United States); Tian, K. [SLAC, Menlo Park, CA (United States); Douglas, D. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Wilson, F. G. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Zhang, S. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Mitsuhashi, T. M. [KEK, Tsukuba (Japan); Shkvarunets, A. G. [University of Maryland, College Park, MD (United States)

    2012-11-01

    We have applied a new imaging/optical masking technique, which employs a digital micro-mirror device (DMD) and optical synchrotron radiation (OSR), to perform high dynamic range (DR) beam imaging at the JLAB Energy Recovery Linac and the SLAC/SPEAR3 Synchrotron Light Source. The OSR from the beam is first focused onto the DMD to produce a primary image; selected areas of this image are spatially filtered by controlling the state of individual micro-mirrors; and finally, the filtered image is refocused onto a CCD camera. At JLAB this technique has been used successfully to view the beam halo with a DR ~ 105. At SPEAR3 the DMD was used to filter out the bright core of the stored beam to study the turn-by-turn dynamics of the 10-3 weaker injected beam. We describe the optical performance, present limitations and our plans to improve the DR of both experimental systems.

  17. Inferior alveolar nerve injury with laryngeal mask airway: a case report.

    LENUS (Irish Health Repository)

    Hanumanthaiah, Deepak

    2011-01-01

    The incidence of damage to the individual cranial nerves and their branches associated with laryngeal mask airway use is low; there have been case reports of damage to the lingual nerve, hypoglossal nerve and recurrent laryngeal nerve. To the best of our knowledge we present the first reported case of inferior alveolar nerve injury associated with laryngeal mask airway use.

  18. Improving light harvesting in polymer photodetector devices through nanoindented metal mask films

    NARCIS (Netherlands)

    Macedo, A. G.; Zanetti, F.; Mikowski, A.; Hummelen, J. C.; Lepienski, C. M.; da Luz, M. G. E.; Roman, L. S.

    2008-01-01

    To enhance light harvesting in organic photovoltaic devices, we propose the incorporation of a metal (aluminum) mask film in the system's usual layout. We fabricate devices in a sandwich geometry, where the mask (nanoindented with a periodic array of holes of sizes d and spacing s) is added between

  19. Early, Equivalent ERP Masked Priming Effects for Regular and Irregular Morphology

    Science.gov (United States)

    Morris, Joanna; Stockall, Linnaea

    2012-01-01

    Converging evidence from behavioral masked priming (Rastle & Davis, 2008), EEG masked priming (Morris, Frank, Grainger, & Holcomb, 2007) and single word MEG (Zweig & Pylkkanen, 2008) experiments has provided robust support for a model of lexical processing which includes an early, automatic, visual word form based stage of morphological parsing…

  20. Rescuing Stimuli from Invisibility: Inducing a Momentary Release from Visual Masking with Pre-Target Entrainment

    Science.gov (United States)

    Mathewson, Kyle E.; Fabiani, Monica; Gratton, Gabriele; Beck, Diane M.; Lleras, Alejandro

    2010-01-01

    At near-threshold levels of stimulation, identical stimulus parameters can result in very different phenomenal experiences. Can we manipulate which stimuli reach consciousness? Here we show that consciousness of otherwise masked stimuli can be experimentally induced by sensory entrainment. We preceded a backward-masked stimulus with a series of…

  1. Masking of vitamin B12 deficiency associated neuropathy by folic acid

    NARCIS (Netherlands)

    Amsterdam JGC van; Opperhuizen A; Jansen EHJM; TOX

    2005-01-01

    The Dutch authorities consider fortifying certain foods with folic acid. Folic acid supplementation may, however, mask vitamin B12 deficiency and increase the incidence of peripheral neuropathy. This literature review outlines published studies to the potential masking of vitamin B12 deficiency rel

  2. Masking Release in Children and Adults with Hearing Loss When Using Amplification

    Science.gov (United States)

    Brennan, Marc; McCreery, Ryan; Kopun, Judy; Lewis, Dawna; Alexander, Joshua; Stelmachowicz, Patricia

    2016-01-01

    Purpose: This study compared masking release for adults and children with normal hearing and hearing loss. For the participants with hearing loss, masking release using simulated hearing aid amplification with 2 different compression speeds (slow, fast) was compared. Method: Sentence recognition in unmodulated noise was compared with recognition…

  3. Early, Equivalent ERP Masked Priming Effects for Regular and Irregular Morphology

    Science.gov (United States)

    Morris, Joanna; Stockall, Linnaea

    2012-01-01

    Converging evidence from behavioral masked priming (Rastle & Davis, 2008), EEG masked priming (Morris, Frank, Grainger, & Holcomb, 2007) and single word MEG (Zweig & Pylkkanen, 2008) experiments has provided robust support for a model of lexical processing which includes an early, automatic, visual word form based stage of morphological parsing…

  4. The Effect of Prime Duration in Masked Orthographic Priming Depends on Neighborhood Distribution

    Science.gov (United States)

    Robert, Christelle; Mathey, Stephanie

    2012-01-01

    A lexical decision task was used with a masked priming procedure to investigate whether and to what extent neighborhood distribution influences the effect of prime duration in masked orthographic priming. French word targets had two higher frequency neighbors that were either distributed over two letter positions (e.g., "LOBE/robe-loge")…

  5. Relevant reduction effect with a modified thermoplastic mask of rotational error for glottic cancer in IMRT

    Science.gov (United States)

    Jung, Jae Hong; Jung, Joo-Young; Cho, Kwang Hwan; Ryu, Mi Ryeong; Bae, Sun Hyun; Moon, Seong Kwon; Kim, Yong Ho; Choe, Bo-Young; Suh, Tae Suk

    2017-02-01

    The purpose of this study was to analyze the glottis rotational error (GRE) by using a thermoplastic mask for patients with the glottic cancer undergoing intensity-modulated radiation therapy (IMRT). We selected 20 patients with glottic cancer who had received IMRT by using the tomotherapy. The image modalities with both kilovoltage computed tomography (planning kVCT) and megavoltage CT (daily MVCT) images were used for evaluating the error. Six anatomical landmarks in the image were defined to evaluate a correlation between the absolute GRE (°) and the length of contact with the underlying skin of the patient by the mask (mask, mm). We also statistically analyzed the results by using the Pearson's correlation coefficient and a linear regression analysis ( P correlation ( P < 0.01). We found a statistical significance for each parameter in the linear regression analysis (mask versus absolute roll: P = 0.004 [ P < 0.05]; mask versus 3D-error: P = 0.000 [ P < 0.05]). The range of the 3D-errors with contact by the mask was from 1.2% - 39.7% between the maximumand no-contact case in this study. A thermoplastic mask with a tight, increased contact area may possibly contribute to the uncertainty of the reproducibility as a variation of the absolute GRE. Thus, we suggest that a modified mask, such as one that covers only the glottis area, can significantly reduce the patients' setup errors during the treatment.

  6. 37 CFR 211.6 - Methods of affixation and placement of mask work notice.

    Science.gov (United States)

    2010-07-01

    ..., LIBRARY OF CONGRESS COPYRIGHT OFFICE AND PROCEDURES MASK WORK PROTECTION § 211.6 Methods of affixation and placement of mask work notice. (a) General. (1) This section specifies methods of affixation and placement... 37 Patents, Trademarks, and Copyrights 1 2010-07-01 2010-07-01 false Methods of affixation...

  7. An empirical approach adressing the transfer of mask placement errors during exposure

    Science.gov (United States)

    Alles, B.; Simeon, B.; Cotte, E.; Wandel, T.; Schulz, B.; Seltmann, R.

    2007-02-01

    Today's semiconductors consist of up to forty structured layers which make up the electric circuit. Since the market demands more powerful chips at minimal cost, the structure size is decreased with every technology node. The smaller the features become, the more sensitive is the functional effciency of the chip with respect to placement errors. One crucial component for placement errors is the mask which can be viewed as a blueprint of the layer's structures. Hence, placement accuracy requirements for masks are also tightening rapidly. These days, mask shops strive for improving their positioning performance. However, more and more effort is required which will increase the costs for masks. Therefore, the transfer of mask placement errors onto the wafer is analyzed in order to check the guidelines which are used for deriving placement error specifications. In the first section of this paper the basic concepts for measuring placement errors are provided. Then, a method is proposed which is able to characterize the transfer of placement errors from mask to wafer. This is followed by two sections giving a thorough statistical analysis of this method. In the fifth section, the connection to placement accuracy specifications on mask and wafer is established. Finally, the method is applied to a set of test masks provided by AMTC and printed by AMD.

  8. Predicting efficiency of post-induction mask ventilation based on demographic and anatomical factors

    Directory of Open Access Journals (Sweden)

    Mahmoud Saghaei

    2012-01-01

    Conclusions: Using EMV is an easy and reliable tool for measuring efficiency of mask ventilation. Based on the result of this study, EMV can be estimated from patient′s demographic and physical factors. In edentolous patients, using the lip-over-mask method results in adequate ventilation of lungs.

  9. Tuning the cognitive environment: Sound masking with 'natural' sounds in open-plan offices

    Science.gov (United States)

    DeLoach, Alana

    With the gain in popularity of open-plan office design and the engineering efforts to achieve acoustical comfort for building occupants, a majority of workers still report dissatisfaction in their workplace environment. Office acoustics influence organizational effectiveness, efficiency, and satisfaction through meeting appropriate requirements for speech privacy and ambient sound levels. Implementing a sound masking system is one tried-and-true method of achieving privacy goals. Although each sound masking system is tuned for its specific environment, the signal -- random steady state electronic noise, has remained the same for decades. This research work explores how `natural' sounds may be used as an alternative to this standard masking signal employed so ubiquitously in sound masking systems in the contemporary office environment. As an unobtrusive background sound, possessing the appropriate spectral characteristics, this proposed use of `natural' sounds for masking challenges the convention that masking sounds should be as meaningless as possible. Through the pilot study presented in this work, we hypothesize that `natural' sounds as sound maskers will be as effective at masking distracting background noise as the conventional masking sound, will enhance cognitive functioning, and increase participant (worker) satisfaction.

  10. Masking of vitamin B12 deficiency associated neuropathy by folic acid

    NARCIS (Netherlands)

    Amsterdam JGC van; Opperhuizen A; Jansen EHJM; TOX

    2005-01-01

    The Dutch authorities consider fortifying certain foods with folic acid. Folic acid supplementation may, however, mask vitamin B12 deficiency and increase the incidence of peripheral neuropathy. This literature review outlines published studies to the potential masking of vitamin B12 deficiency

  11. Perceptual effects of noise reduction by time-frequency masking of noisy speech.

    Science.gov (United States)

    Brons, Inge; Houben, Rolph; Dreschler, Wouter A

    2012-10-01

    Time-frequency masking is a method for noise reduction that is based on the time-frequency representation of a speech in noise signal. Depending on the estimated signal-to-noise ratio (SNR), each time-frequency unit is either attenuated or not. A special type of a time-frequency mask is the ideal binary mask (IBM), which has access to the real SNR (ideal). The IBM either retains or removes each time-frequency unit (binary mask). The IBM provides large improvements in speech intelligibility and is a valuable tool for investigating how different factors influence intelligibility. This study extends the standard outcome measure (speech intelligibility) with additional perceptual measures relevant for noise reduction: listening effort, noise annoyance, speech naturalness, and overall preference. Four types of time-frequency masking were evaluated: the original IBM, a tempered version of the IBM (called ITM) which applies limited and non-binary attenuation, and non-ideal masking (also tempered) with two different types of noise-estimation algorithms. The results from ideal masking imply that there is a trade-off between intelligibility and sound quality, which depends on the attenuation strength. Additionally, the results for non-ideal masking suggest that subjective measures can show effects of noise reduction even if noise reduction does not lead to differences in intelligibility.

  12. Oxygen mask fit analysis in F-16 fighter pilots using 3D imaging

    NARCIS (Netherlands)

    Schreinemakers, J.R.C.; Oudenhuijzen, A.J.K.; Amerongen, P.C.G.M. van; Kon, M.

    2013-01-01

    Background: The majority of Dutch F-16 pilots experience in-flight oxygen mask related nasal discomfort and injury. We aimed to analyze the fit of the oxygen mask. Methods: We successfully scanned 35 pilots with a 3D scanner to measure the distance between the contact area on the nose and the oxygen

  13. STARTLE RESPONSES OF SPIDER PHOBICS TO MASKED STIMULI - A PILOT-STUDY

    NARCIS (Netherlands)

    MERCKELBACH, H; de Jong, Peter; LEEUW, W.J.F.; VANDENHOUT, MA

    1995-01-01

    The present study tested the hypothesis that briefly flashed and backwardly masked phobic stimuli potentiate startle reflexes in phobic subjects. Spider phobic (n = 17) and normal control (n = 12) subjects were exposed to short (30 ms) and backwardly masked presentations of phobic slides (i.e., spid

  14. Sandwich Priming: A Method for Overcoming the Limitations of Masked Priming by Reducing Lexical Competitor Effects

    Science.gov (United States)

    Lupker, Stephen J.; Davis, Colin J.

    2009-01-01

    An orthographically similar masked nonword prime facilitates responding in a lexical decision task (Forster & Davis, 1984). Recently, this masked priming paradigm has been used to evaluate models of orthographic coding--models that attempt to quantify prime-target similarity. One general finding is that priming effects often do not occur when…

  15. Analysis of oxygen mask-induced soft tissue and nasal bone problems in F-16 pilots

    NARCIS (Netherlands)

    Schreinemakers, J.R.C.

    2014-01-01

    In the present dissertation we investigated the effect of in-flight oxygen masks on the noses of Royal Netherlands Air Force (RNLAF) F-16 pilots. We explained the use of an in-flight oxygen mask by RNLAF F-16 pilots, and presented the medical complaints associated with its usage and related to the

  16. Oxygen mask fit analysis in F-16 fighter pilots using 3D imaging

    NARCIS (Netherlands)

    Schreinemakers, J.R.C.; Oudenhuijzen, A.J.K.; Amerongen, P.C.G.M. van; Kon, M.

    2013-01-01

    Background: The majority of Dutch F-16 pilots experience in-flight oxygen mask related nasal discomfort and injury. We aimed to analyze the fit of the oxygen mask. Methods: We successfully scanned 35 pilots with a 3D scanner to measure the distance between the contact area on the nose and the oxygen

  17. Prototype of an energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general mask based laser material processing (MBLMP) is a process which suffers from a low energy efficiency, because the majority of the laser light is absorbed in or reflected by the mask. We have developed a device called an energy enhancer which is capable of improving the energy efficiency...

  18. Modelling binaural processes involved in simultaneous reflection masking: limitations of current models

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2007-01-01

    Masked thresholds were measured for a single test reflection, masked by the direct sound, as a function of the reflection delay. This was done for diotic as well as for dichotic stimulus presentations and all stimuli were presented via headphones. The input signal was a 200-ms long broadband nois...

  19. Current approach to masked hypertension: From diagnosis to clinical management.

    LENUS (Irish Health Repository)

    Dolan, Eamon

    2013-11-28

    The term masked hypertension phenomenon was first described by the late Professor Thomas Pickering and is commonly defined as having a normal clinic blood pressure (BP) but an elevated "out of office" reading. In the main these elevated readings have been provided through ambulatory blood pressure monitoring (ABPM) but sometimes home BP monitoring is used. It is now largely accepted that ABPM gives a better classification of risk than clinic BP. Thus the elevated ABPM levels should relate to higher cardiovascular risk and it follows that these people might be regarded as being genuinely hypertensive and at higher cardiovascular risk. The problem for clinical practice is how to identify and manage these subjects. The phenomenon should be suspected in subjects who have had an elevated clinic BP at some time, in young subjects with normal or normal-high clinic BP who have early left ventricular hypertrophy, in subjects with a family history of hypertension in both parents, patients with multiple risks for cardiovascular disease and perhaps diabetic patients. It appears to be more prevalent in subjects of male gender, with younger age, higher heart rate, obesity or high cholesterol levels and in smokers. Those with masked hypertension are at higher risk of events such as stroke and have a higher prevalence of target organ damage, for example, nephropathy. In conclusion most of the debate around this topic relates to its reliable identification. Given the higher ambulatory readings there is an increases cardiovascular risk making this diagnosis important. This article is protected by copyright. All rights reserved.

  20. TASTE MASKING AND FORMULATION OF ONDANSETRON HYDROCHLORIDE MOUTH DISSOLVING TABLETS

    Directory of Open Access Journals (Sweden)

    Shyam Raj Subedi, Bhupendra Kumar Poudel

    2015-05-01

    Full Text Available This study was done to mask the bitter taste of ondansetron HCl using complexing agent, a polacrilex resin: Tulsion 335 and subsequently forming mouth dissolving tablet using superdisintegrants: Croscarmellose sodium and sodium starch glycollate. A preliminary screening was done. Batch process, a most preferential method for drug loading with ion exchange resins was selected. The process was optimized for drug: resin ratio to get maximum drug loading. A ratio of drug: resin at 1:3 was selected. Taste evaluation was carried out by selecting volunteers. Drug resin complex (DRC was evaluated for drug release. The resultant DRC was formulated by direct compression into mouth dissolving tablet using microcrystalline cellulose PH 102, as diluent and croscarmalose sodium and sodium starch glycolate as superdisintegrants and aspartame was used as sweetening agent to enhance palatability. Thirteen formulations were developed by using superdisintegrants: croscarmellose sodium and sodium starch glycolate. Concentration of superdisintegrants ranged from 0.75-9.24 %. The formulated tablet had satisfactory disintegration time and dissolution profile. Optimization was carried out using central composite design. The disintegration and dissolution times were tallied with marketed ondansetron HCl tablets. From the results, it was deduced that the most effective concentration for desired disintegration was of croscarmellose sodium and sodium starch glycollate respectively at concentration above 5%. Therefore, it can be concluded that the intensely bitter taste of ondansetron HCl can be masked by using tulsion 335 and mouth dissolving ondansetron HCl can be successfully prepared by adding aforementioned superdisintegrants. This sort of mouth dissolving ondansetron HCl can be used in controlling vomiting in paediatric and geriatric patients and also for pregnancy induced vomiting.