Sample records for laser sputtering parameters
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International Nuclear Information System (INIS)
Mozhaev, P.B.; Ovsyannikov, G.A.; Skov, J.L.
1999-01-01
Effect of laser sputtering parameters on crystalline properties of CeO 2 buffer layers grown on (1102) orientation sapphire substrate and on properties of YBa 2 Cu 3 O x superconducting thin films was studied. It was shown that depending on the sputtering conditions one might observe growth of CeO 2 (100) and (111) orientations. Varying heater temperature, chamber pressure and density of laser ray energy on the target one managed to obtain mono-oriented buffer layer of the desired orientation [ru
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A flexible platform for simulations of sputtering hollow cathode discharges for laser applications
Mihailova, D.B.; Grozeva, M.; Hagelaar, G.J.M.; Dijk, van J.; Brok, W.J.M.; Mullen, van der J.J.A.M.
2008-01-01
The Plasimo modelling platform, extended with a cathode wall sputtering module is used to study the discharge processes and to optimise the design parameters of a sputtering hollow cathode discharge (HCD). We present Plasimo simulations of a HCD used for laser applications. A time dependent
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Laser sputter neutral mass spectrometry
Energy Technology Data Exchange (ETDEWEB)
King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics
1993-12-31
Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.
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Laser sputter neutral mass spectrometry
Energy Technology Data Exchange (ETDEWEB)
King, B V; Clarke, M; Hu, H; Betz, [Newcastle Univ., NSW (Australia). Dept. of Physics
1994-12-31
Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.
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Influence of the mechanical properties of sputtered Mo solar cell back contacts on laser scribing
Energy Technology Data Exchange (ETDEWEB)
Schultz, Christof; Schuele, Manuel; Quaschning, Volker; Stegemann, Bert; Fink, Frank [University of Applied Sciences (HTW) Berlin, Wilhelminenhofstr. 75A, 12459 Berlin (Germany); Endert, Heinrich [Newport Spectra-Physics GmbH, Ruhlsdorfer Strasse 95, 14532 Stahnsdorf (Germany); Bonse, Joern [BAM Bundesanstalt fuer Materialforschung und -pruefung, Berlin (Germany); Rau, Bjoern; Schlatmann, Rutger [PVcomB - Competence Centre Thin-Film and Nanotechnology for Photovoltaics Berlin, Schwarzschildstr. 3, 12489 Berlin (Germany)
2012-07-01
In thin-film photovoltaics complete laser structuring of the solar modules is aimed to perform appropriate monolithic serial interconnection. We have studied the laser ablation behavior of sputtered molybdenum back contacts for chalcopyrite solar cells. The properties of these Mo layer are sensitive to the sputter conditions. The process pressure influences the mechanical layer properties and, thus, contributes directly to the quality of the laser scribes. Precise, reliable and reproducible laser scribing requires the proper adaptation of the laser parameters to the material properties. In our study it was achieved by comprehensive analysis of the laser matter interaction and by detailed determination of the ablation thresholds as a function of the Mo layer thickness and ductility for different laser wavelengths and pulse durations, accompanied by thermal modeling.
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Energy Technology Data Exchange (ETDEWEB)
Yamamoto, S. (Nitto Denko Corp., Osaka (Japan)); Kubo, U. (Kinki University, Osaka (Japan))
1994-06-20
The wettability of PTFE (polytetrafluoroethylene) surfaces was improved by sputter etching and excimer laser irradiation. In sputter etching, the PTFE surface was treated by reactive sputter etching with H2O gas to give active groups on the surface. In laser irradiation, the surface was irradiated in pure water by high-energy KrF excimer laser. As the surface wettability was evaluated with a contact angle to water, the contact angle decreased remarkably in both treatments resulting in a good improvement effect. In sputter etching, various new chemical bonds such as F-C=O, F2C-FC-O, F2C-C-O and C-O were observed because of a decrease in F and incorporation of oxygen. Such chemical bonds could be eliminated by ultraviolet ray irradiation, and the treated surface condition approached the initial condition after irradiation of 200 hours. In laser irradiation, it was suggested that C-F bonds were broken, and OH groups were added to the surface by dissociation of H2O to H and OH. 7 refs., 8 figs., 1 tab.
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International Nuclear Information System (INIS)
Kelly, R.; Cuomo, J.J.; Leary, P.A.; Rothenburg, J.E.; Braren, B.E.; Aliotta, C.F.
1985-01-01
Irradiation, i.e. bombardment, with 193 nm laser pulses having an energy fluence of 2.5 J/cm 2 and a duration of proportional12 ns leads to rapid sputtering with Au, Al 2 O 3 , MgO, MgO.Al 2 O 3 , SiO 2 , glass, and LaB 6 , relatively slow sputtering with MgF 2 and diamond, and mainly thermal-stress cracking with W. Scanning electron microscopy (SEM) suggests that the mechanism for the sputtering of Au in either vacuum or air is one based on the hydrodynamics of molten Au, while an SEM-derived surface temperature estimate confirms that thermal sputtering (which might have been expected) is not possible. SEM with W shows that the near total lack of material removal is due to the thermal-stress cracking not leading to completed exfoliation, together with the surface temperature being too low for either hydrodynamical or thermal processes. Corresponding SEM with Al 2 O 3 shows, in the case of specimens bombarded in vacuum, topography of such a type that all mechanisms except electronic ones can be ruled out. The topography of Al 2 O 3 or other oxides bombarded in air through a mask is somewhat different, showing craters as for vacuum bombardments but ones which have a cone-like pattern on the bottom. (orig.)
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Laser Trimming of CuAlMo Thin-Film Resistors: Effect of Laser Processing Parameters
Birkett, Martin; Penlington, Roger
2012-08-01
This paper reports the effect of varying laser trimming process parameters on the electrical performance of a novel CuAlMo thin-film resistor material. The films were prepared on Al2O3 substrates by direct-current (DC) magnetron sputtering, before being laser trimmed to target resistance value. The effect of varying key laser parameters of power, Q-rate, and bite size on the resistor stability and tolerance accuracy were systematically investigated. By reducing laser power and bite size and balancing this with Q-rate setting, significant improvements in resistor stability and resistor tolerance accuracies of less than ±0.5% were achieved.
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Laser fluorescence spectroscopy of sputtered uranium atoms
International Nuclear Information System (INIS)
Wright, R.B.; Pellin, M.J.; Gruen, D.M.; Young, C.E.
1979-01-01
Laser induced fluorescence (LIF) spectroscopy was used to study the sputtering of 99.8% 238 U metal foil when bombarded by normally incident 500 to 3000 eV Ne + , Ar + , Kr + , and O 2 + . A three-level atom model of the LIF processes is developed to interpret the observed fluorescent emission from the sputtered species. The model shows that close attention must be paid to the conditions under which the experiment is carried out as well as to the details of the collision cascade theory of sputtering. Rigorous analysis shows that when properly applied, LIF can be used to investigate the predictions of sputtering theory as regards energy distributions of sputtered particles and for the determination of sputtering yields. The possibility that thermal emission may occur during sputtering can also be tested using the proposed model. It is shown that the velocity distribution (either the number density or flux density distribution, depending upon the experimental conditions) of the sputtered particles can be determined using the LIF technique and that this information can be used to obtain a description of the basic sputtering mechanisms. These matters are discussed using the U-atom fluorescence measurements as a basis. The relative sputtering yields for various incident ions on uranium were also measured for the first time using the LIF technique. A surprisingly high fraction of the sputtered uranium atoms were found to occupy the low lying metastable energy levels of U(I). The population of the sputtered metastable atoms were found approximately to obey a Boltzman distribution with an effective temperature of 920 +- 100 0 K. 41 references
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DEFF Research Database (Denmark)
Mozhaev, P. B.; Ovsyannikov, G. A.; Skov, Johannes
1999-01-01
The effect of the laser sputtering parameters on the crystal properties of CeO2 buffer layers grown on a (1 (1) under bar 02) sapphire substrate and on the properties of superconducting YBa2Cu3Ox thin films are investigated. It is shown that (100) and (111) CeO2 growth is observed, depending on t...
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Growth of Sr1-xNdxCuOy thin films by rf-magnetron sputtering and pulsed-laser deposition
International Nuclear Information System (INIS)
Sugii, N.; Ichikawa, M.; Kuba, K.; Sakurai, T.; Iamamoto, K.; Yamauchi, H.
1992-01-01
This paper reports on Sr 1- x Nd x CuO y thin films grown on SrTiO 3 substrates by rf-magnetron sputtering and pulsed-laser deposition. The sputter-deposited film with x=0 has an infinite-layer structure whose lattice constants are: a=0.390 nm and c=0.347 nm. When x is larger than 0.1, the films contain a phase of the Sr 14 Cu 24 O 41 structure. The laser-deposited films of Sr 1- x Nd x CuO y with x ≥ 0.075 were single phase of the infinite-layer structure. The lattice parameter c decreased and the lattice parameter a increased, as the Nd content, x, increased. The films with x=0.10 and 0.125 exhibited superconducting onset temperatures around 26 K. Weak Meissner signals were observed for these films at temperatures below 30 K
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Femtosecond laser-induced periodic surface nanostructuring of sputtered platinum thin films
Energy Technology Data Exchange (ETDEWEB)
Rodríguez, Ainara, E-mail: airodriguez@ceit.es [CIC microGUNE, Goiru Kalea 9 Polo Innovación Garaia, 20500 Arrasate-Mondragón (Spain); CEIT-IK4 & Tecnun (University of Navarra), Paseo Manuel Lardizábal 15, 20018 San Sebastián (Spain); Morant-Miñana, Maria Carmen; Dias-Ponte, Antonio; Martínez-Calderón, Miguel; Gómez-Aranzadi, Mikel; Olaizola, Santiago M. [CIC microGUNE, Goiru Kalea 9 Polo Innovación Garaia, 20500 Arrasate-Mondragón (Spain); CEIT-IK4 & Tecnun (University of Navarra), Paseo Manuel Lardizábal 15, 20018 San Sebastián (Spain)
2015-10-01
Highlights: • Femtosecond laser-induced surface nanostructures on sputtered platinum thin films. • Three types of structures obtained: random nanostructures, LSFL and HSFL. • Two different modification regimes have been established based on laser fluence. - Abstract: In this work, submicro and nanostructures self-formed on the surface of Platinum thin films under femtosecond laser-pulse irradiation are investigated. A Ti:Sapphire laser system was used to linearly scan 15 mm lines with 100 fs pulses at a central wavelength of 800 nm with a 1 kHz repetition rate. The resulting structures were characterized by scanning electron microscopy (SEM) and 2D-Fast Fourier Transform (2D-FFT) analysis. This analysis of images revealed different types of structures depending on the laser irradiation parameters: random nanostructures, low spatial frequency LIPSS (LSFL) with a periodicity from about 450 to 600 nm, and high spatial frequency LIPSS (HSFL) with a periodicity from about 80 to 200 nm. Two different modifications regimes have been established for the formation of nanostructures: (a) a high-fluence regime in which random nanostructures and LSFL are obtained and (b) a low-fluence regime in which HSFL and LSFL are obtained.
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Sputtering of amorphous carbon layers studied by laser induced fluorescence
International Nuclear Information System (INIS)
Pasch, E.
1992-07-01
In order to minimize the radiation losses, it is desirable to keep the plasmas in nuclear fusion devices free of high-Z-impurities. Therefore, the walls of TEXTOR and other tokamaks are covered with thin layers of amorphous carbon layers (a-C:H) or amorphous carbon/boron layers (a-C/B:H). The sputtering behaviour of these layers has been studied under bombardment by Ar + ions with energies of 1.5 keV and current densities of a few mA/cm 2 . Investigations of these coatings were carried out with the object to measure the velocity distribution of the sputtered atoms and the sputtered yields by laser induced fluorescence in the vacuum ultraviolet. (orig.)
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Influence of R.F. sputter parameters on the magnetic orientation of Co-Cr layers
Lodder, J.C.; Wielinga, T.
1984-01-01
Co-Cr layers for the perpendicular recording mode were deposited by means of RF-sputtering. The most important sputter parameters, i.e. the RF sputter high voltage VRF, the argon pressure Par and the substrate holder temperature Tsh, gave an optimum value for perpendicular orientation of the
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Geometrical features in longitudinal sputtering hollow cathode discharges for laser applications
Mihailova, D.B.; Dijk, van J.; Hagelaar, G.J.M.; Karatodorov, S.; Zahariev, P.; Grozeva, M.; Mullen, van der J.J.A.M.
2012-01-01
Longitudinal sputtering hollow cathode discharge (HCD) used as active medium for lasing is studied by means of numerical modelling. Due to the longitudinal non-uniformities of the discharge, the laser operation could be strongly affected. The non-uniformity of the discharge is mainly influenced by
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Dependence of plasma characteristics on dc magnetron sputter parameters
International Nuclear Information System (INIS)
Wu, S.Z.
2005-01-01
Plasma discharge characteristics of a dc magnetron system were measured by a single Langmuir probe at the center axis of the dual-side process chamber. Plasma potential, floating potential, electron and ion densities, and electron temperature were extracted with varying dc power and gas pressure during sputter deposition of a metal target; strong correlations were shown between these plasma parameters and the sputter parameters. The electron density was controlled mostly by secondary electron generation in constant power mode, while plasma potential reflects the confinement space variation due to change of discharge voltage. When discharge pressure was varied, plasma density increases with the increased amount of free stock molecules, while electron temperature inversely decreased, due to energy-loss collision events. In low-pressure discharges, the electron energy distribution function measurements show more distinctive bi-Maxwellian distribution, with the fast electron temperature gradually decreases with increased gas pressure
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Energy Technology Data Exchange (ETDEWEB)
Lautenschläger, T. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Feder, R., E-mail: thomas.lautenschlaeger@iom-leipzig.de [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Neumann, H. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Rice, C.; Schubert, M. [Department of Electrical and Computer Engineering and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511 (United States); Bundesmann, C. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany)
2016-10-15
Highlights: • Ion beam sputter deposition under systematic variation of process parameters. • Angular and energy distribution of secondary particles. • Interaction between incorporated and impinging process gas. • Measured data compared with simulations. - Abstract: In the present study, the influence of ion energy and geometrical parameters onto the angular and energy distribution of secondary particles for sputtering a Ti target with Ar ions is investigated. The angular distribution of the particle flux of the sputtered Ti atoms was determined by the collection method, i.e. by growing Ti films and measuring their thickness. The formal description of the particle flux can be realized by dividing it into an isotropic and an anisotropic part. The experimental data show that increasing the ion energy or decreasing the ion incidence angle lead to an increase of the isotropic part, which is in good agreement with basic sputtering theory. The energy distribution of the secondary ions was measured using an energy-selective mass spectrometer. The energy distribution of the sputtered target ions shows a maximum at an energy between 10 eV and 20 eV followed by a decay proportional to E{sup −n}, which is in principle in accordance with Thompson’s theory, followed by a high energetic tail. When the sum of incidence angle and emission angle is increased, the high-energetic tail expands to higher energies and an additional peak due to direct sputtering events may occur. In the case of backscattered primary Ar ions, a maximum at an energy between 5 eV and 10 eV appears and, depending on the scattering geometry, an additional broad peak at a higher energy due to direct scattering events is observed. The center energy of the additional structure shifts systematically to higher energies with decreasing scattering angle or increasing ion energy. The experimental results are compared to calculations based on simple elastic two-particle-interaction theory and to
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International Nuclear Information System (INIS)
Baragiola, R.A.; Vidal, R.A.; Svendsen, W.; Schou, J.; Shi, M.; Bahr, D.A.; Atteberrry, C.L.
2003-01-01
We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from the decay of H(2p) atoms sputtered by heavy ion impact, but not bulk ice luminescence. Radiolyzed ice does not sputter under 3.7 eV laser irradiation
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International Nuclear Information System (INIS)
Schweer, H.B.
1983-11-01
In this work investigations are described to measure the flux density of sputtered iron atoms by means of laser induced fluorescence. In a laboratory experiment an iron target (stainless steel 316, Inconel 600), was bombarded with 10 keV Ar + and 2.5 keV H + and the population distribution of the energy levels of the ground state a 5 D and the metastable state a 5 F was measured. In the plasma wall region in the ISX-B tokamak at the Oak Ridge National Laboratory (USA) neutral iron atoms were measured the first time by laser induced fluorescence. A detection limit of 10 6 atoms/cm 3 was found and sputtered iron atoms were observed in the first 15 ms of the discharge. (orig./BRB)
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Energy Technology Data Exchange (ETDEWEB)
Bundesmann, Carsten; Feder, Rene; Neumann, Horst [Leibniz-Institut fuer Oberflaechenmodifizierung e.V., Leipzig (Germany)
2012-07-01
Ion beam sputtering (IBS) offers, in contrast to other physical vapour deposition techniques, such as magnetron sputtering or electron beam evaporation, the opportunity to change the properties of the layer forming particles (sputtered and scattered particles) by varying ion beam parameters (ion species, ion energy) and geometrical parameters (ion incidence angle, emission angle). Consequently, these effects can be utilized to tailor thin film properties [1]. The goal is to study systematically the correlations between the primary and secondary parameters and, at last, the effects on the properties of Si thin films, such as optical properties, stress, surface topography and composition. First experimental results are presented for Ar-ion sputtering of Si.
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Baryshev, Sergey V; Erck, Robert A; Moore, Jerry F; Zinovev, Alexander V; Tripa, C Emil; Veryovkin, Igor V
2013-02-27
In materials science and engineering it is often necessary to obtain quantitative measurements of surface topography with micrometer lateral resolution. From the measured surface, 3D topographic maps can be subsequently analyzed using a variety of software packages to extract the information that is needed. In this article we describe how white light interferometry, and optical profilometry (OP) in general, combined with generic surface analysis software, can be used for materials science and engineering tasks. In this article, a number of applications of white light interferometry for investigation of surface modifications in mass spectrometry, and wear phenomena in tribology and lubrication are demonstrated. We characterize the products of the interaction of semiconductors and metals with energetic ions (sputtering), and laser irradiation (ablation), as well as ex situ measurements of wear of tribological test specimens. Specifically, we will discuss: i. Aspects of traditional ion sputtering-based mass spectrometry such as sputtering rates/yields measurements on Si and Cu and subsequent time-to-depth conversion. ii. Results of quantitative characterization of the interaction of femtosecond laser irradiation with a semiconductor surface. These results are important for applications such as ablation mass spectrometry, where the quantities of evaporated material can be studied and controlled via pulse duration and energy per pulse. Thus, by determining the crater geometry one can define depth and lateral resolution versus experimental setup conditions. iii. Measurements of surface roughness parameters in two dimensions, and quantitative measurements of the surface wear that occur as a result of friction and wear tests. Some inherent drawbacks, possible artifacts, and uncertainty assessments of the white light interferometry approach will be discussed and explained.
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Laser micromachining of sputtered DLC films
International Nuclear Information System (INIS)
Fu, Y.Q.; Luo, J.K.; Flewitt, A.J.; Ong, S.E.; Zhang, S.; Milne, W.I.
2006-01-01
DLC films with different thicknesses (from 100 nm to 1.9 μm) were deposited using sputtering of graphite target in pure argon atmosphere without substrate heating. Film microstructures (sp 2 /sp 3 ratio) and mechanical properties (modulus, hardness, stress) were characterized as a function of film thickness. A thin layer of aluminum about 60 nm was deposited on the DLC film surface. Laser micromachining of Al/DLC layer was performed to form microcantilever structures, which were released using a reactive ion etching system with SF 6 plasma. Due to the intrinsic stress in DLC films and bimorph Al/DLC structure, the microcantilevers bent up with different curvatures. For DLC film of 100 nm thick, the cantilever even formed microtubes. The relationship between the bimorph beam bending and DLC film properties (such as stress, modulus, etc.) were discussed in details
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Ion beam sputter coatings for laser technology
Ristau, Detlev; Gross, Tobias
2005-09-01
The initial motivation for the development of Ion Beam Sputtering (IBS) processes was the need for optical coatings with extremely low optical scatter losses for laser gyros. Especially, backscattering of the gyro-mirrors couples the directional modes in the ring resonator leading to the lock in effect which limits the sensitivity of the gyro. Accordingly, the first patent on IBS was approved for an aircraft company (Litton) in 1978. In the course of the rapid development of the IBS-concept during the last two decades, an extremely high optical quality could be achieved for laser coatings in the VIS- and NIR-spectral region. For example, high reflecting coatings with total optical losses below 1 ppm were demonstrated for specific precision measurement applications with the Nd:YAG-laser operating at 1.064 μm. Even though the high quality level of IBS-coatings had been confirmed in many applications, the process has not found its way into the production environment of most optical companies. Major restrictions are the relatively low rate of the deposition process and the poor lateral homogeneity of the coatings, which are related to the output characteristics of the currently available ion sources. In the present contribution, the basic principles of IBS will be discussed in the context of the demands of modern laser technology. Besides selected examples for special applications of IBS, aspects will be presented for approaches towards rapid manufacturing of coatings and the production of rugate filters on the basis of IBS-techniques.
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Energy Technology Data Exchange (ETDEWEB)
Boukhicha, Rym, E-mail: rym.boukhicha@polytechnique.edu [CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau (France); Charpentier, Coralie [CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau (France); Total S and M — New Energies Division, R and D Division, Department of Solar Energies EN/BO/RD/SOL, Tour Michelet, 24 cours Michelet, La Défense 10, 92069 Paris La Défense Cedex (France); Prod' Homme, Patricia [Total S and M — New Energies Division, R and D Division, Department of Solar Energies EN/BO/RD/SOL, Tour Michelet, 24 cours Michelet, La Défense 10, 92069 Paris La Défense Cedex (France); Roca i Cabarrocas, Pere [CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau (France); Lerat, Jean-François; Emeraud, Thierry [Photovoltaic Business Unit, Excico Group NV, Kempische Steenweg 305/2, B-3500 Hasselt (Belgium); Johnson, Erik [CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau (France)
2014-03-31
We explore the influence of the sputtering deposition conditions on the outcome of an excimer laser anneal and chemical etching process with the goal of producing highly textured substrates for thin film silicon solar cells. Aluminum-doped zinc oxide (ZnO:Al) thin films were prepared on glass substrates by radio frequency magnetron sputtering from a ceramic target at room temperature. The effects of the process pressure (0.11–1.2 Pa) and oxygen flow (0–2 sccm) on the optical and electrical properties of ZnO:Al thin films have been studied both before and after an excimer laser annealing treatment followed by a dilute HCl chemical etch. The as-deposited films varied from completely opaque to yellowish. Thin film laser annealing dramatically improves the optical properties of the most opaque thin films. After laser annealing at the optimum fluence, the average transmittance in the visible wavelength range was around 80% for most films, and reasonable electrical performance was obtained for the films deposited at lower pressures and without oxygen flux (7 Ω/□ for films of 1 μm). After etching, all films displayed a dramatic improvement in haze, but only the low pressure, low oxygen films retained acceptable electrical properties (< 11 Ω/□). - Highlights: • Al:ZnO thin films were deposited at room temperature. • The ZnO:Al films were excimer laser annealed and then wet-etched. • The optical and electrical properties were studied in details.
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International Nuclear Information System (INIS)
Yamamura, Yasumichi; Shimizu, Ryuichi; Shimizu, Hazime; Ito, Noriaki.
1983-01-01
The research on ion-induced sputtering has been continued for a long time, since a hundred or more years ago. However, it was only in 1969 by Sigmund that the sputtering phenomena were theoretically arranged into the present form. The reason why the importance of sputtering phenomena have been given a new look recently is the application over wide range. This paper is a review centering around the mechanism of causing sputtering and its characteristics. Sputtering is such a phenomenon that the atoms in the vicinity of a solid surface are emitted into vacuum by receiving a part of ion energy, or in other words, it is a kind of irradiation damage in the vicinity of a solid surface. In this meaning, it can be considered that the sputtering based on the ions located on the clean surface of a single element metal is simple, and has already been basically understood. On the contrary, the phenomena can not be considered to be fully understood in the case of alloys and compounds, because these surface conditions under irradiation are not always clear due to segregation and others. In the paper, the physical of sputtering, single element sputtering, the sputtering in alloys and compounds, and the behaviour of emitted particles are explained. Finally, some recent topics of the sputtering measurement by laser resonant excitation, the sputtering by electron excitation, chemical sputtering, and the sputtering in nuclear fusion reactors are described. (Wakatsuki, Y.)
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Fan, Yiqiang
2013-12-16
We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.
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Preheat effect on titanium plate fabricated by sputter-free selective laser melting in vacuum
Sato, Yuji; Tsukamoto, Masahiro; Shobu, Takahisa; Yamashita, Yorihiro; Yamagata, Shuto; Nishi, Takaya; Higashino, Ritsuko; Ohkubo, Tomomasa; Nakano, Hitoshi; Abe, Nobuyuki
2018-04-01
The dynamics of titanium (Ti) melted by laser irradiation was investigated in a synchrotron radiation experiment. As an indicator of wettability, the contact angle between a selective laser melting (SLM) baseplate and the molten Ti was measured by synchrotron X-rays at 30 keV during laser irradiation. As the baseplate temperature increased, the contact angle decreased, down to 28° at a baseplate temperature of 500 °C. Based on this result, the influence of wettability of a Ti plate fabricated by SLM in a vacuum was investigated. It was revealed that the improvement of wettability by preheating suppressed sputtering generation, and a surface having a small surface roughness was fabricated by SLM in a vacuum.
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Formation of large clusters during sputtering of silver
International Nuclear Information System (INIS)
Staudt, C.; Heinrich, R.; Wucher, A.
2000-01-01
We have studied the formation of polyatomic clusters during sputtering of metal surfaces by keV ion bombardment. Both positively charged (secondary cluster ions) and neutral clusters have been detected in a time-of-flight mass spectrometer under otherwise identical experimental conditions, the sputtered neutrals being post-ionized by single photon absorption using a pulsed 157 nm VUV laser beam. Due to the high achievable laser intensity, the photoionization of all clusters could be saturated, thus enabling a quantitative determination of the respective partial sputtering yields. We find that the relative yield distributions of sputtered clusters are strongly correlated with the total sputtering yield in a way that higher yields lead to higher abundances of large clusters. By using heavy projectile ions (Xe + ) in connection with bombarding energies up to 15 keV, we have been able to detect sputtered neutral silver clusters containing up to about 60 atoms. For cluster sizes above 40 atoms, doubly charged species are shown to be produced in the photoionization process with non-negligible efficiency. From a direct comparison of secondary neutral and ion yields, the ionization probability of sputtered clusters is determined as a function of the cluster size. It is demonstrated that even the largest silver clusters are still predominantly sputtered as neutrals
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Directory of Open Access Journals (Sweden)
Peng-cheng Huang
2013-01-01
Full Text Available Molybdenum (Mo thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9 orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr, dc power (W, and substrate temperature (°C, are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110 for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity.
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Shibagaki, K.; Nafarizal, N.; Sasaki, K.; Toyoda, H.; Iwata, S.; Kato, T.; Tsunashima, S.; Sugai, H.
2003-10-01
Magnetron sputtering discharge is widely used as an efficient method for thin film fabrication. In order to achieve the optimized fabrication, understanding of the kinetics in plasmas is essential. In the present work, we measured the density distribution of sputtered Fe atoms using laser-induced fluorescence imaging spectroscopy. A dc magnetron plasma source with a Fe target was used. An area of 20 × 2 mm in front of the target was irradiated by a tunable laser beam having a planar shape. The picture of laser-induced fluorescence on the laser beam was taken using an ICCD camera. In this way, we obtained the two-dimensional image of the Fe atom density. As a result, it has been found that the Fe atom density observed at a distance of several centimeters from the target is higher than that adjacent to the target, when the Ar gas pressure was relatively high. It is suggested from this result that some gas-phase production processes of Fe atoms are available in the plasma. This work has been performed under the 21st Century COE Program by the Ministry of Education, Culture, Sports, Science and Technology in Japan.
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Influence of source parameters on the growth of metal nanoparticles by sputter-gas-aggregation
Khojasteh, Malak; Kresin, Vitaly V.
2017-11-01
We describe the production of size-selected manganese nanoclusters using a magnetron sputtering/aggregation source. Since nanoparticle production is sensitive to a range of overlapping operating parameters (in particular, the sputtering discharge power, the inert gas flow rates, and the aggregation length), we focus on a detailed map of the influence of each parameter on the average nanocluster size. In this way, it is possible to identify the main contribution of each parameter to the physical processes taking place within the source. The discharge power and argon flow supply the metal vapor, and argon also plays a crucial role in the formation of condensation nuclei via three-body collisions. However, the argon flow and the discharge power have a relatively weak effect on the average nanocluster size in the exiting beam. Here the defining role is played by the source residence time, governed by the helium supply (which raises the pressure and density of the gas column inside the source, resulting in more efficient transport of nanoparticles to the exit) and by the aggregation path length.
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Charged particle and laser irradiation of selected materials
International Nuclear Information System (INIS)
Svendsen, W.E.
1996-11-01
The main topics of the present thesis are the processes governing electronic sputtering of insulators and laser ablation of metals and insulators. The sputtering yield for electron bombardment of solid deuterium was investigated using quartz crystal microbalances as the measuring technique. The sputtering yield was measured with varying electron energy and deuterium film thickness. Laser ablation measurements of silver and nickel were carried out using a Nd:YAG laser. The effect of various experimental parameters such as background gas pressure (Ar, N 2 ), position of quartz crystals with respect to target position and the optimal number of laser shots for carrying out the experiments were investigated. The deposition rate was measured with varying laser wavelength and laser fluence. The angular distribution of the ablated material was measured for silver as well. A theoretical model based on the thermal properties of laser interaction with metals was applied in the initial phase of ablation. For the non-thermal processes governing laser interaction with the ablated plasma plume, a model developed by Phipps and Dreyfus was used to interpret the results. Laser ablation measurements of water-ice were carried using a Nitrogen laser. Attempts were made to measure the deposition rate for various the laser wavelengths and energies. (au) 8 tabs., 49 ills., 77 refs
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Charged particle and laser irradiation of selected materials
Energy Technology Data Exchange (ETDEWEB)
Svendsen, W E
1996-11-01
The main topics of the present thesis are the processes governing electronic sputtering of insulators and laser ablation of metals and insulators. The sputtering yield for electron bombardment of solid deuterium was investigated using quartz crystal microbalances as the measuring technique. The sputtering yield was measured with varying electron energy and deuterium film thickness. Laser ablation measurements of silver and nickel were carried out using a Nd:YAG laser. The effect of various experimental parameters such as background gas pressure (Ar, N{sub 2}), position of quartz crystals with respect to target position and the optimal number of laser shots for carrying out the experiments were investigated. The deposition rate was measured with varying laser wavelength and laser fluence. The angular distribution of the ablated material was measured for silver as well. A theoretical model based on the thermal properties of laser interaction with metals was applied in the initial phase of ablation. For the non-thermal processes governing laser interaction with the ablated plasma plume, a model developed by Phipps and Dreyfus was used to interpret the results. Laser ablation measurements of water-ice were carried using a Nitrogen laser. Attempts were made to measure the deposition rate for various the laser wavelengths and energies. (au) 8 tabs., 49 ills., 77 refs.
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Energy Technology Data Exchange (ETDEWEB)
Serra, R., E-mail: ricardo.serra@dem.uc.pt [SEG-CEMUC, Mechanical Engineering Department, University of Coimbra, Rua Luís Reis Santos, 3030-788 Coimbra (Portugal); Oliveira, V. [ICEMS-Instituto de Ciência e Engenharia de Materiais e Superfícies, Avenida Rovisco Pais no 1, 1049-001 Lisbon (Portugal); Instituto Superior de Engenharia de Lisboa, Avenida Conselheiro Emídio Navarro no 1, 1959-007 Lisbon (Portugal); Oliveira, J.C. [SEG-CEMUC, Mechanical Engineering Department, University of Coimbra, Rua Luís Reis Santos, 3030-788 Coimbra (Portugal); Kubart, T. [The Ångström Laboratory, Solid State Electronics, P.O. Box 534, SE-751 21 Uppsala (Sweden); Vilar, R. [Instituto Superior de Engenharia de Lisboa, Avenida Conselheiro Emídio Navarro no 1, 1959-007 Lisbon (Portugal); Instituto Superior Técnico, Avenida Rovisco Pais no 1, 1049-001 Lisbon (Portugal); Cavaleiro, A. [SEG-CEMUC, Mechanical Engineering Department, University of Coimbra, Rua Luís Reis Santos, 3030-788 Coimbra (Portugal)
2015-03-15
Highlights: • Large-area LIPSS were formed by femtosecond laser processing B-C films surface. • The LIPSS spatial period increases with laser fluence (140–200 nm). • Stress-related sinusoidal-like undulations were formed on the B-C films surface. • The undulations amplitude (down to a few nanometres) increases with laser fluence. • Laser radiation absorption increases with surface roughness. - Abstract: Amorphous and crystalline sputtered boron carbide thin films have a very high hardness even surpassing that of bulk crystalline boron carbide (≈41 GPa). However, magnetron sputtered B-C films have high friction coefficients (C.o.F) which limit their industrial application. Nanopatterning of materials surfaces has been proposed as a solution to decrease the C.o.F. The contact area of the nanopatterned surfaces is decreased due to the nanometre size of the asperities which results in a significant reduction of adhesion and friction. In the present work, the surface of amorphous and polycrystalline B-C thin films deposited by magnetron sputtering was nanopatterned using infrared femtosecond laser radiation. Successive parallel laser tracks 10 μm apart were overlapped in order to obtain a processed area of about 3 mm{sup 2}. Sinusoidal-like undulations with the same spatial period as the laser tracks were formed on the surface of the amorphous boron carbide films after laser processing. The undulations amplitude increases with increasing laser fluence. The formation of undulations with a 10 μm period was also observed on the surface of the crystalline boron carbide film processed with a pulse energy of 72 μJ. The amplitude of the undulations is about 10 times higher than in the amorphous films processed at the same pulse energy due to the higher roughness of the films and consequent increase in laser radiation absorption. LIPSS formation on the surface of the films was achieved for the three B-C films under study. However, LIPSS are formed under
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International Nuclear Information System (INIS)
Serra, R.; Oliveira, V.; Oliveira, J.C.; Kubart, T.; Vilar, R.; Cavaleiro, A.
2015-01-01
Highlights: • Large-area LIPSS were formed by femtosecond laser processing B-C films surface. • The LIPSS spatial period increases with laser fluence (140–200 nm). • Stress-related sinusoidal-like undulations were formed on the B-C films surface. • The undulations amplitude (down to a few nanometres) increases with laser fluence. • Laser radiation absorption increases with surface roughness. - Abstract: Amorphous and crystalline sputtered boron carbide thin films have a very high hardness even surpassing that of bulk crystalline boron carbide (≈41 GPa). However, magnetron sputtered B-C films have high friction coefficients (C.o.F) which limit their industrial application. Nanopatterning of materials surfaces has been proposed as a solution to decrease the C.o.F. The contact area of the nanopatterned surfaces is decreased due to the nanometre size of the asperities which results in a significant reduction of adhesion and friction. In the present work, the surface of amorphous and polycrystalline B-C thin films deposited by magnetron sputtering was nanopatterned using infrared femtosecond laser radiation. Successive parallel laser tracks 10 μm apart were overlapped in order to obtain a processed area of about 3 mm 2 . Sinusoidal-like undulations with the same spatial period as the laser tracks were formed on the surface of the amorphous boron carbide films after laser processing. The undulations amplitude increases with increasing laser fluence. The formation of undulations with a 10 μm period was also observed on the surface of the crystalline boron carbide film processed with a pulse energy of 72 μJ. The amplitude of the undulations is about 10 times higher than in the amorphous films processed at the same pulse energy due to the higher roughness of the films and consequent increase in laser radiation absorption. LIPSS formation on the surface of the films was achieved for the three B-C films under study. However, LIPSS are formed under different
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Shalnov, K V; Kukhta, V R; Uemura, K; Ito, Y
2012-06-01
In the work, investigation of the features and operation regimes of sputter enhanced ion-plasma source are presented. The source is based on the target sputtering with the dense plasma formed in the crossed electric and magnetic fields. It allows operation with noble or reactive gases at low pressure discharge regimes, and, the resulting ion beam is the mixture of ions from the working gas and sputtering target. Any conductive material, such as metals, alloys, or compounds, can be used as the sputtering target. Effectiveness of target sputtering process with the plasma was investigated dependently on the gun geometry, plasma parameters, and the target bias voltage. With the applied accelerating voltage from 0 to 20 kV, the source can be operated in regimes of thin film deposition, ion-beam mixing, and ion implantation. Multi-component ion beam implantation was applied to α-Fe, which leads to the surface hardness increasing from 2 GPa in the initial condition up to 3.5 GPa in case of combined N(2)-C implantation. Projected range of the implanted elements is up to 20 nm with the implantation energy 20 keV that was obtained with XPS depth profiling.
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International Nuclear Information System (INIS)
Cranton, Wayne M.; Wilson, Sharron L.; Ranson, Robert; Koutsogeorgis, Demosthenes C.; Chi Kuangnan; Hedgley, Richard; Scott, John; Lipiec, Stephen; Spiller, Andrew; Speakman, Stuart
2007-01-01
The feasibility of low-temperature fabrication of transparent electrode elements from thin films of antimony-doped tin oxide (SnO 2 :Sb, ATO) has been investigated via inkjet printing, rf magnetron sputtering and post-deposition excimer laser processing. Laser processing of thin films on both glass and plastic substrates was performed using a Lambda Physik 305i excimer laser, with fluences in the range 20-100 mJ cm -2 reducing sheet resistance from as-deposited values by up to 3 orders of magnitude. This is consistent with TEM analysis of the films that shows a densification of the upper 200 nm of laser-processed regions
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Effect of sputtering parameters and substrate composition on the structure of tantalum thin films
Energy Technology Data Exchange (ETDEWEB)
Hallmann, Lubica, E-mail: lubica.hallmann@zzm.uzh.c [Clinic of Fixed and Removable Prosthodontics and Dental Material Science, Center of Dental Medicine, University of Zürich (Switzerland); Ulmer, Peter [Institute of Geochemistry and Petrology, ETH Zürich (Switzerland)
2013-10-01
The crystallographic properties of tantalum films deposited as a bioactive coating on Co–Cr–Mo and Ti–Al–Nb alloys have been investigated. The desired tough and ductile alpha phase of tantalum has been obtained by DC magnetron sputtering on Co–Cr–Mo and Ti–Al–Nb substrates. The thickness of the tantalum layer was between 20 and 600 nm. The crystallographic structure of tantalum thin film was dependent on the sputtering parameters such as DC power, bias voltage and gas impurities. Oxygen is an important factor for the stabilization of the tantalum alpha phase on Co–Cr–Mo substrate. The crystallographic structure and texture of tantalum thin films was found to be additionally dependent on the substrate composition. For Ti–Al–Nb substrate, oxygen content was not an important factor for the stabilization of the alpha phase. The observed shift of X-ray diffraction peaks to lower 2(θ) is an indication of stress evolving during the sputtering process and was dependent on bias voltage and oxygen content of the carrier gas.
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International Nuclear Information System (INIS)
Luine, J.; Daly, K.; Hu, R.; Kain, A.; Lee, A.; Manasevit, H.; Pettiette-Hall, C.; Simon, R.; St John, D.; Wagner, M.
1991-01-01
This paper reports on a parallel-plate resonator technique previously used to measure microwave surface resistance R s (T) extended to also measure absolute penetration depth λ(T). Measurements of both quantities near 10 GHz from 4.2 K to Tc are reported for ErBaCuO thin films produced by metal-organic chemical vapor deposition (MOCVD) and YBaCuO think films produced by laser ablation and single-target off-axis sputtering. All the films were made at TRW. Each production method gives rise to films whose surface resistance is below 1 milliohm at temperatures below 40K. The low temperature penetration depths range from 250 nm for the laser ablation and sputtered films to 800 nm for the MOCVD films. The penetration depths in all cases increase with temperature according to the Gorter-Casimir temperature dependence
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International Nuclear Information System (INIS)
Besland, M.P.; Djani-ait Aissa, H.; Barroy, P.R.J.; Lafane, S.; Tessier, P.Y.; Angleraud, B.; Richard-Plouet, M.; Brohan, L.; Djouadi, M.A.
2006-01-01
Bi 4-x La x Ti 3 O 12 (BLT x ) (x = 0 to 1) thin films were grown on silicon (100) and platinized substrates Pt/TiO 2 /SiO 2 /Si using RF diode sputtering, magnetron sputtering and pulsed laser deposition (PLD). Stoichiometric home-synthesized targets were used. Reactive sputtering was investigated in argon/oxygen gas mixture, with a pressure ranging from 0.33 to 10 Pa without heating the substrate. PLD was investigated in pure oxygen, at a chamber pressure of 20 Pa for a substrate temperature of 400-440 deg. C. Comparative structural, chemical, optical and morphological characterizations of BLT thin films have been performed by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X-Ray Photoelectron Spectroscopy (XPS), Spectro-ellipsometric measurements (SE) and Atomic Force Microscopy (AFM). Both sputtering techniques allow to obtain uniform films with thickness ranging from 200 to 1000 nm and chemical composition varying from (Bi,La) 2 Ti 3 O 12 to (Bi,La) 4.5 Ti 3 O 12 , depending on deposition pressure and RF power. In addition, BLT films deposited by magnetron sputtering, at a pressure deposition ranging from 1.1 to 5 Pa, were well-crystallized after a post-deposition annealing at 650 deg. C in oxygen. They exhibit a refractive index and optical band gap of 2.7 and 3.15 eV, respectively. Regarding PLD, single phase and well-crystallized, 100-200 nm thick BLT films with a stoichiometric (Bi,La) 4 Ti 3 O 12 chemical composition were obtained, exhibiting in addition a preferential orientation along (200). It is worth noting that BLT films deposited by magnetron sputtering are as well-crystallized than PLD ones
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Sputtering. [as deposition technique in mechanical engineering
Spalvins, T.
1976-01-01
This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.
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Energy Technology Data Exchange (ETDEWEB)
Badgujar, Amol C.; Dhage, Sanjay R., E-mail: dhage@arci.res.in; Joshi, Shrikant V.
2015-08-31
Copper indium gallium selenide (CIGS) has emerged as a promising candidate for thin film solar cells, with efficiencies approaching those of silicon-based solar cells. To achieve optimum performance in CIGS solar cells, uniform, conductive, stress-free, well-adherent, reflective, crystalline molybdenum (Mo) thin films with preferred orientation (110) are desirable as a back contact on large area glass substrates. The present study focuses on cylindrical rotating DC magnetron sputtered bilayer Mo thin films on 300 mm × 300 mm soda lime glass (SLG) substrates. Key sputtering variables, namely power and Ar gas flow rates, were optimized to achieve best structural, electrical and optical properties. The Mo films were comprehensively characterized and found to possess high degree of thickness uniformity over large area. Best crystallinity, reflectance and sheet resistance was obtained at high sputtering powers and low argon gas flow rates, while mechanical properties like adhesion and residual stress were found to be best at low sputtering power and high argon gas flow rate, thereby indicating a need to arrive at a suitable trade-off during processing. - Highlights: • Sputtering of bilayer molybdenum thin films on soda lime glass • Large area deposition using rotating cylindrical direct current magnetron • Trade of sputter process parameters power and pressure • High uniformity of thickness and best electrical properties obtained • Suitable mechanical and optical properties of molybdenum are achieved for CIGS application.
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Growing LaAlO3/SrTiO3 interfaces by sputter deposition
Directory of Open Access Journals (Sweden)
I. M. Dildar
2015-06-01
Full Text Available Sputter deposition of oxide materials in a high-pressure oxygen atmosphere is a well-known technique to produce thin films of perovskite oxides in particular. Also interfaces can be fabricated, which we demonstrated recently by growing LaAlO3 on SrTiO3 substrates and showing that the interface showed the same high degree of epitaxy and atomic order as is made by pulsed laser deposition. However, the high pressure sputtering of oxides is not trivial and number of parameters are needed to be optimized for epitaxial growth. Here we elaborate on the earlier work to show that only a relatively small parameter window exists with respect to oxygen pressure, growth temperature, radiofrequency power supply and target to substrate distance. In particular the sensitivity to oxygen pressure makes it more difficult to vary the oxygen stoichiometry at the interface, yielding it insulating rather than conducting.
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Fan, Yiqiang; Li, Huawei; Yi, Ying; Foulds, Ian G.
2013-01-01
We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax
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Critical parameters in the sputter-deposition of NdBa{sub 2}Cu{sub 3}O{sub 7-{delta}} thin films
Energy Technology Data Exchange (ETDEWEB)
Hakuraku, Y.; Yokoyama, N.; Doi, T.; Inoue, T. [Faculty of Engineering, Kagoshima University, Koorimoto, Kagoshima 890, (Japan); Mori, Z.; Koba, S. [Yatsushiro National College of Technology, Yatsushiro 866 (Japan)
1999-08-01
A superconducting thin film of NdBa{sub 2}Cu{sub 3}O{sub 7-{delta}} (NBCO) was prepared on an MgO(100) substrate by dc magnetron sputtering. Superconducting properties as well as features such as resistivity at room temperature and surface morphology were improved by optimizing the composition of sputtering target and critical parameters such as substrate temperature and oxidation gas pressure. A highly c-axis oriented thin film with T{sub c} (zero resistance temperature) = 95.2 K was obtained reproducibly with NdBa{sub 2}Cu{sub 3.2}O{sub 7-{delta}} off-stoichiometric target sputtering. T{sub c} = 95.2 K was 8 K higher than that deposited by stoichiometric target sputtering. Critical current density was 1x10{sup 6} A cm{sup -2} at 77 K, and surface roughness was 35 nm. (author)
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Sensitivity and stability of sputtered sandwich photocells
International Nuclear Information System (INIS)
Murray, H.; Piel, A.
1979-01-01
The physical parameters of sputtered Metal-Semiconductor-Metal photocells are described in view of solar energy conversion. Specific properties of sputtered films lead to a particular stability of physical parameters such as dark conduction, capacitance and dielectric losses. Interband transitions occur when the photon energy is larger than the bandgap of the photoconductor. The transport of photo-excited carriers in the built-in electric field involves the existence of a photovoltaic effect. The influence of sputtering on the specific properties of solar energy conversion is discussed. (author)
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Energy Technology Data Exchange (ETDEWEB)
Nazon, J.; Sarradin, J.; Flaud, V.; Tedenac, J.C. [Institut Charles Gerhardt, UMR 5253 CNRS-UM2-ENSCM-UM1, cc 1504, Place E. Bataillon, 34095 Montpellier Cedex 5 (France); Frety, N. [Institut Charles Gerhardt, UMR 5253 CNRS-UM2-ENSCM-UM1, cc 1504, Place E. Bataillon, 34095 Montpellier Cedex 5 (France)], E-mail: Nicole.Frety@univ-montp2.fr
2008-09-22
The effects of processing parameters on the properties of tantalum nitride thin films deposited by radio frequency reactive sputtering have been investigated. The influence of the N{sub 2} partial and (Ar + N{sub 2}) total gas pressures as well as the sputtering power on the microstructure and electrical properties is reported. Rising the N{sub 2} partial pressure, from 2 to 10.7%, induces a change in the composition of the {delta}-TaN phase, from TaN to TaN{sub 1.13}. This composition change is associated with a drastic increase of the electrical resistivity over a 7.3% N{sub 2} partial pressure. The total gas pressure is revealed to strongly affect the film microstructure since a variation in both composition and grain size is observed when the gas pressure rises from 6.8 to 24.6 Pa. When the sputtering power varied between 50 and 110 W, an increase of the grain size related to a decrease of the electrical resistivity is observed.
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Blue Diode Laser Absorption Spectroscopy of Pulsed Magnetron Discharge
Czech Academy of Sciences Publication Activity Database
Olejníček, Jiří; Do, H.T.; Hubička, Zdeněk; Hippler, R.; Jastrabík, Lubomír
2006-01-01
Roč. 45, 10B (2006), s. 8090-8094 ISSN 0021-4922 R&D Projects: GA AV ČR 1QS100100563; GA ČR GA202/05/2242 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z10100520 Keywords : laser absorption spectroscopy * pulsed magnetron * sputtering parameters Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.222, year: 2006
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Laser-based secondary neutral mass spectroscopy: Useful yield and sensitivity
International Nuclear Information System (INIS)
Young, C.E.; Pellin, M.J.; Calaway, W.F.; Joergensen, B.; Schweitzer, E.L.; Gruen, D.M.
1986-01-01
A variety of problems exist in order to optimally apply resonance ionization spectroscopy (RIS) to the detection of sputtered neutral atoms, however. Several of these problems and their solutions are examined in this paper. First, the possible useful yields obtainable and the dependence of useful yield on various laser parameters for this type of sputtered neutral mass spectrometer (SNMS) are considered. Second, the choice of a mass spectrometer and its effect on the instrumental useful yield is explored in light of the unique ionization region for laser based SNMS. Finally a brief description of noise sources and their effect on the instrumental sensitivity is discussed. 33 refs., 12 figs
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International Nuclear Information System (INIS)
Gallais, Laurent; Capoulade, Jeremie; Natoli, Jean-Yves; Commandre, Mireille; Cathelinaud, Michel; Koc, Cian; Lequime, Michel
2008-01-01
A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO2 starting material), reactive low voltage ion plating, and dual ion beam sputtering.The laser damage thresholds of these coatings are determined at 1064 and 355 nm using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy
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Energy Technology Data Exchange (ETDEWEB)
El-Hamshary, Azza Amin
2011-07-11
In this work, an atomistic understanding of the growth of TiO{sub 2} thin films under the influence of various sputtering process parameters has been developed. It has been demonstrated that tailoring the structure of the reactively sputtered TiO{sub 2} thin films is possible by controlling the sputtering process parameters. Different sputtering techniques like dcMS, IBAS and HiPIMS have been utilized to fabricate TiO{sub 2} thin films. These films exhibit two crystalline structures, namely anatase and rutile. Sample preparation has been performed at different conditions, varying e.g. energetic bombardment, oxygen partial pressure and film thickness. It has been found that the formation of each phase is governed by specific parameters. For instance, energetic bombardment promotes the growth of the rutile structure. On the other hand, the growth of the anatase phase profits from the absence or very weak ion bombardment. Additionally, the anatase phase was often found for growth at high oxygen partial pressure or for thick films, whereas a rutile structure was formed otherwise. Additional substrate heating was also found to support the formation of the anatase phase. It has been demonstrated that energetic bombardment plays a dominant role in the structure formation. It has been proven that the bombardment of the growing film with highly energetic negative oxygen ions inherent in the sputtering process promotes the growth of the rutile structure. This has been observed by an investigation of the sample profile utilizing new and aged targets, since the distribution of oxygen ion bombardment along the substrate depends on the age of the target. Further support was found from investigating films grown in a HiPIMS process, where the negative oxygen ions with high energies are the dominant species governing structure formation. Furthermore, pure rutile films have also been grown under additional ion bombardment in an ion-assisted DC sputtering process. These results also
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Uniform elemental analysis of materials by sputtering and photoionization mass spectrometry
International Nuclear Information System (INIS)
Chun, He; Basler, J.N.; Becker, C.H.
1997-01-01
Analysis of the elemental composition of surfaces commonly involves techniques in which atoms or ions are ablated from the material's surface and detected by mass spectrometry. Secondary-ion mass spectrometry is widely used for detection with high sensitivity (down to a few parts per billion) but technical problems prevent it from being truly quantitative. Some of these problems are circumvented by nonresonant laser post-ionization of sputtered atoms followed by time-of-flight mass spectrometry (surface analysis by laser ionization: SALI). But when there are large differences in ionization probabilities amongst different elements in the material, the detection sensitivity can be non-uniform and accurate quantification remains out of reach. Here we report that highly uniform, quantitative and sensitive analysis of materials can be achieved using a high-energy (5-keV) ion beam for sputtering coupled with a very-high-intensity laser to induce multiphoton ionization of the sputtered atoms. We show uniform elemental sensitivity for several samples containing elements with very different ionization potentials, suggesting that this approach can now be regarded as quantitative for essentially any material. (author)
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International Nuclear Information System (INIS)
Auciello, O.; Ameen, M.S.; Kingon, A.I.
1989-01-01
Results from computer simulation and experiments on ion scattering and sputtering processes in ion beam sputter deposition of high Tc superconducting and ferroelectric thin films are presented. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom ass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering Kr + or Xe + ions is preferable to the most commonly used Ar + ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing multicomponent oxide thin films by ion beam sputter-deposition. 10 refs., 5 figs
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Small sample analysis using sputter atomization/resonance ionization mass spectrometry
International Nuclear Information System (INIS)
Christie, W.H.; Goeringer, D.E.
1986-01-01
We have used secondary ion mass spectrometry (SIMS) to investigate the emission of ions via argon sputtering from U metal, UO 2 , and U 3 O 8 samples. We have also used laser resonance ionization techniques to study argon-sputtered neutral atoms and molecules emitted from these same samples. For the case of U metal, a significant enhancement in detection sensitivity for U is obtained via SA/RIMS. For U in the fully oxidized form (U 3 O 8 ), SA/RIMS offers no improvement in U detection sensitivity over conventional SIMS when sputtering with argon. 9 refs., 1 fig., 2 tabs
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Computer simulation of the self-sputtering of uranium
International Nuclear Information System (INIS)
Robinson, M.T.
1983-01-01
The sputtering of polycrystalline α-uranium by uranium ions of energies below 10 keV has been studied in the binary collision approximation using the computer simulation program marlowe. Satisfactory agreement of the computed sputtering yields with the small amount of available experimental data was achieved using the Moliere interatomic potential, a semilocal inelastic loss function, and a planar surface binding barrier, all with conventional parameters. The model is used to discuss low energy sputtering processes and the energy and angular distributions of the reflected primaries and the sputtered target particles
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Selection of Near Optimal Laser Cutting Parameters in CO2 Laser Cutting by the Taguchi Method
Directory of Open Access Journals (Sweden)
Miloš MADIĆ
2013-12-01
Full Text Available Identification of laser cutting conditions that are insensitive to parameter variations and noise is of great importance. This paper demonstrates the application of Taguchi method for optimization of surface roughness in CO2 laser cutting of stainless steel. The laser cutting experiment was planned and conducted according to the Taguchi’s experimental design using the L27 orthogonal array. Four laser cutting parameters such as laser power, cutting speed, assist gas pressure, and focus position were considered in the experiment. Using the analysis of means and analysis of variance, the significant laser cutting parameters were identified, and subsequently the optimal combination of laser cutting parameter levels was determined. The results showed that the cutting speed is the most significant parameter affecting the surface roughness whereas the influence of the assist gas pressure can be neglected. It was observed, however, that interaction effects have predominant influence over the main effects on the surface roughness.
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Influence of processing parameters on lattice parameters in laser deposited tool alloy steel
Energy Technology Data Exchange (ETDEWEB)
Sun, G.F., E-mail: gfsun82@gmail.com [Center for Laser-Aided Intelligent Manufacturing, University of Michigan, Ann Arbor, MI, 48109 (United States); School of Mechanical Engineering, Jiangsu University, Zhenjiang, Jiangsu, 212013 (China); Bhattacharya, S. [Center for Laser-Aided Intelligent Manufacturing, University of Michigan, Ann Arbor, MI, 48109 (United States); Dinda, G.P.; Dasgupta, A. [Center for Advanced Technologies, Focus: Hope, Detroit, MI, 48238 (United States); Mazumder, J. [Center for Laser-Aided Intelligent Manufacturing, University of Michigan, Ann Arbor, MI, 48109 (United States)
2011-06-15
Highlights: {yields} Orientation relationships among phases in the DMD are given. {yields} Martensite lattice parameters increased with laser specific energy. {yields} Austenite lattice parameters decreased with laser specific energy. - Abstract: Laser aided direct metal deposition (DMD) has been used to form AISI 4340 steel coating on the AISI 4140 steel substrate. The microstructural property of the DMD coating was analyzed by means of scanning electron microscopy, transmission electron microscopy and X-ray diffractometry. Microhardness of the DMD was measured with a Vickers microhardness tester. Results indicate that DMD can be used to form dense AISI 4340 steel coatings on AISI 4140 steel substrate. The DMD coating is mainly composed of martensite and retained austenite. Consecutive thermal cycles have a remarkable effect on the microstructure of the plan view of the DMD coating and on the corresponding microhardness distribution. Orientation relationships among austenite, martensite and cementite in the DMD coating followed the ones in conventional heat treated steels. As the laser specific energy decreased, cooling rate increased, and martensite peaks broadened and shifted to a lower Bragg's angle. Also martensite lattice parameters increased and austenite lattice parameters decreased due to the above parameter change.
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Influence of processing parameters on lattice parameters in laser deposited tool alloy steel
International Nuclear Information System (INIS)
Sun, G.F.; Bhattacharya, S.; Dinda, G.P.; Dasgupta, A.; Mazumder, J.
2011-01-01
Highlights: → Orientation relationships among phases in the DMD are given. → Martensite lattice parameters increased with laser specific energy. → Austenite lattice parameters decreased with laser specific energy. - Abstract: Laser aided direct metal deposition (DMD) has been used to form AISI 4340 steel coating on the AISI 4140 steel substrate. The microstructural property of the DMD coating was analyzed by means of scanning electron microscopy, transmission electron microscopy and X-ray diffractometry. Microhardness of the DMD was measured with a Vickers microhardness tester. Results indicate that DMD can be used to form dense AISI 4340 steel coatings on AISI 4140 steel substrate. The DMD coating is mainly composed of martensite and retained austenite. Consecutive thermal cycles have a remarkable effect on the microstructure of the plan view of the DMD coating and on the corresponding microhardness distribution. Orientation relationships among austenite, martensite and cementite in the DMD coating followed the ones in conventional heat treated steels. As the laser specific energy decreased, cooling rate increased, and martensite peaks broadened and shifted to a lower Bragg's angle. Also martensite lattice parameters increased and austenite lattice parameters decreased due to the above parameter change.
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UV and IR laser radiation's interaction with metal film and teflon surfaces
Fedenev, A. V.; Alekseev, S. B.; Goncharenko, I. M.; Koval', N. N.; Lipatov, E. I.; Orlovskii, V. M.; Shulepov, M. A.; Tarasenko, V. F.
2003-04-01
The interaction of Xe ([lambda] [similar] 1.73 [mu]m) and XeCl (0.308 [mu]m) laser radiation with surfaces of metal and TiN-ceramic coatings on glass and steel substrates has been studied. Correlation between parameters of surface erosion versus laser-specific energy was investigated. Monitoring of laser-induced erosion on smooth polished surfaces was performed using optical microscopy. The correlation has been revealed between characteristic zones of thin coatings damaged by irradiation and energy distribution over the laser beam cross section allowing evaluation of defects and adhesion of coatings. The interaction of pulsed periodical CO2 ([lambda] [similar] 10.6 [mu]m), and Xe ([lambda] [similar] 1.73 [mu]m) laser radiation with surfaces of teflon (polytetrafluoroethylene—PTFE) has been studied. Monitoring of erosion track on surfaces was performed through optical microscopy. It has been shown that at pulsed periodical CO2-radiation interaction with teflon the sputtering of polymer with formation of submicron-size particles occurs. Dependencies of particle sizes, form, and sputtering velocity on laser pulse duration and target temperature have been obtained.
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Krawczak, Ewelina; Agata, Zdyb; Gulkowski, Slawomir; Fave, Alain; Fourmond, Erwann
2017-11-01
Transparent Conductive Oxides (TCOs) characterized by high visible transmittance and low electrical resistivity play an important role in photovoltaic technology. Aluminum doped zinc oxide (AZO) is one of the TCOs that can find its application in thin film solar cells (CIGS or CdTe PV technology) as well as in other microelectronic applications. In this paper some optical and electrical properties of ZnO:Al thin films deposited by RF magnetron sputtering method have been investigated. AZO layers have been deposited on the soda lime glass substrates with use of variable technological parameters such as pressure in the deposition chamber, power applied and temperature during the process. The composition of AZO films has been investigated by EDS method. Thickness and refraction index of the deposited layers in dependence on certain technological parameters of sputtering process have been determined by spectroscopic ellipsometry. The measurements of transmittance and sheet resistance were also performed.
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Novel magnetic controlled plasma sputtering method
International Nuclear Information System (INIS)
Axelevich, A.; Rabinovich, E.; Golan, G.
1996-01-01
A novel method to improve thin film vacuum sputtering is presented. This method is capable of controlling the sputtering plasma via an external set of magnets, in a similar fashion to the tetrode sputtering method. The main advantage of the Magnetic Controlled Plasma Sputtering (MCPS) is its ability to independently control all deposition parameters without any interference or cross-talk. Deposition rate, using the MCPS, is found to be almost twice the rate of triode and tetrode sputtering techniques. Experimental results using the MCPS to deposit Ni layers are described. It was demonstrated that using the MCPS method the ion beam intensity at the target is a result of the interaction of a homogeneous external magnetic field and the controlling magnetic fields. The MCPS method was therefore found to be beneficial for the production of pure stoichiometric thin solid films with high reproducibility. This method could be used for the production of compound thin films as well. (authors)
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International Nuclear Information System (INIS)
Hikov, Todor; Pecheva, Emilia; Petrov, Todor; Montgomery, Paul; Antoni, Frederic; Leong-Hoi, Audrey
2017-01-01
This work aims at evaluating the possibility of introducing state-of-the-art commercial femtosecond laser system in restorative dentistry by maintaining well-known benefits of lasers for caries removal, but also in overcoming disadvantages such as thermal damage of irradiated substrate. Femtosecond ablation of dental hard tissue is investigated by changing the irradiation parameters (pulsed laser energy, scanning speed and pulse repetition rate), assessed for enamel and dentin. The femtosecond laser system used in this work may be suitable for cavity preparation in dentin and enamel, due to the expected effective ablation and low temperature increase when using ultra short laser pulses. If adequate laser parameters are selected, this system seems to be promising for promoting a laser-assisted, minimally invasive approach in restorative dentistry. (paper)
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High-rate reactive magnetron sputtering of zirconia films for laser optics applications
International Nuclear Information System (INIS)
Juskevicius, K.; Subacius, A.; Drazdys, R.; Juskenas, R.; Audronis, M.; Matthews, A.; Leyland, A.
2014-01-01
ZrO 2 exhibits low optical absorption in the near-UV range and is one of the highest laser-induced damage threshold (LIDT) materials; it is, therefore, very attractive for laser optics applications. This paper reports explorations of reactive sputtering technology for deposition of ZrO 2 films with low extinction coefficient k values in the UV spectrum region at low substrate temperature. A high deposition rate (64 % of the pure metal rate) process is obtained by employing active feedback reactive gas control which creates a stable and repeatable deposition processes in the transition region. Substrate heating at 200 C was found to have no significant effect on the optical ZrO 2 film properties. The addition of nitrogen to a closed-loop controlled process was found to have mostly negative effects in terms of deposition rate and optical properties. Open-loop O 2 gas-regulated ZrO 2 film deposition is slow and requires elevated (200 C) substrate temperature or post-deposition annealing to reduce absorption losses. Refractive indices of the films were distributed in the range n = 2.05-2.20 at 1,000 nm and extinction coefficients were in the range k = 0.6 x 10 -4 and 4.8 x 10 -3 at 350 nm. X-ray diffraction analysis showed crystalline ZrO 2 films consisted of monoclinic + tetragonal phases when produced in Ar/O 2 atmosphere and monoclinic + rhombohedral or a single rhombohedral phase when produced in Ar/O 2 + N 2 . Optical and physical properties of the ZrO 2 layers produced in this study are suitable for high-power laser applications in the near-UV range. (orig.)
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Kim, Ilwhan; Hyun, Seungmin; Nam, Seunghoon; Lee, Hoo-Jeong; Kang, Chiwon
2018-05-01
In this study, we fabricate a three-dimensional (3D) crystalline Si (c-Si)/carbon nanotube (CNT) nanocomposite anode by sputtering Si on 3D CNTs followed by laser annealing for Si crystallization — a simple, cost-effective route — for advanced Li-ion battery (LIB) applications. We use scanning electron microscopy, X-ray diffraction spectroscopy, and Raman spectroscopy to analyze the samples annealed at different laser energy densities. As a result, we confirm that laser annealing enables Si crystallization without damaging the CNTs. We assemble half-type coin cells for the battery performance test: the 3D c-Si/CNT anode sample demonstrates a specific capacity superior to that of its control counterpart; the cyclic stability is also enhanced significantly.
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Directory of Open Access Journals (Sweden)
Krawczak Ewelina
2017-01-01
Full Text Available Transparent Conductive Oxides (TCOs characterized by high visible transmittance and low electrical resistivity play an important role in photovoltaic technology. Aluminum doped zinc oxide (AZO is one of the TCOs that can find its application in thin film solar cells (CIGS or CdTe PV technology as well as in other microelectronic applications. In this paper some optical and electrical properties of ZnO:Al thin films deposited by RF magnetron sputtering method have been investigated. AZO layers have been deposited on the soda lime glass substrates with use of variable technological parameters such as pressure in the deposition chamber, power applied and temperature during the process. The composition of AZO films has been investigated by EDS method. Thickness and refraction index of the deposited layers in dependence on certain technological parameters of sputtering process have been determined by spectroscopic ellipsometry. The measurements of transmittance and sheet resistance were also performed.
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Lau Sheng, Annie; Ismail, Izwan; Nur Aqida, Syarifah
2018-03-01
This study presents the effects of laser parameters on the surface roughness of laser modified tool steel after thermal cyclic loading. Pulse mode Nd:YAG laser was used to perform the laser surface modification process on AISI H13 tool steel samples. Samples were then treated with thermal cyclic loading experiments which involved alternate immersion in molten aluminium (800°C) and water (27°C) for 553 cycles. A full factorial design of experiment (DOE) was developed to perform the investigation. Factors for the DOE are the laser parameter namely overlap rate (η), pulse repetition frequency (f PRF) and peak power (Ppeak ) while the response is the surface roughness after thermal cyclic loading. Results indicate the surface roughness of the laser modified surface after thermal cyclic loading is significantly affected by laser parameter settings.
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Laser etching as an alternative
International Nuclear Information System (INIS)
Dreyfus, R.W.; Kelly, R.
1989-01-01
Atoms and molecules are removed from surfaces by intense laser beams. This fact has been known almost since the discovery of the laser. Within the present overall area of interest, namely understanding ion-beam-induced sputtering, it is equally important both to contrast laser etching to ion sputtering and to understand the underlying physics taking place during laser etching. Beyond some initial broad observations, the specific discussion is limited to, and aimed at, two areas: (i) short wavelength, UV, laser-pulse effects and (ii) energy fluences sufficiently small that only monolayers (and not microns) of material are removed per pulse. 38 refs.; 13 figs.; 5 tabs
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Recent progress in thin film processing by magnetron sputtering with plasma diagnostics
International Nuclear Information System (INIS)
Han, Jeon G
2009-01-01
The precise control of the structure and related properties becomes crucial for sophisticated applications of thin films deposited by magnetron sputtering in emerging industries including the flat panel display, digital electronics and nano- and bio-industries. The film structure is closely related to the total energy delivered to the substrate surface for nucleation and growth during all kinds of thin film processes, including magnetron sputtering. Therefore, the energy delivered to the surface for nucleation and growth during magnetron sputtering should be measured and analysed by integrated diagnostics of the plasma parameters which are closely associated with the process parameters and other external process conditions. This paper reviews the background of thin film nucleation and growth, the status of magnetron sputtering technology and the progress of plasma diagnostics for plasma processing. The evolution of the microstructure during magnetron sputtering is then discussed with respect to the change in the process variables in terms of the plasma parameters along with empirical data of the integrated plasma diagnostics for various magnetron sputtering conditions with conventional dc, pulsed dc and high power pulsed dc sputtering modes. Among the major energy terms to be discussed are the temperature change in the top surface region and the energies of ions and neutral species. (topical review)
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International Nuclear Information System (INIS)
Socol, G.; Macovei, A.M.; Miroiu, F.; Stefan, N.; Duta, L.; Dorcioman, G.; Mihailescu, I.N.; Petrescu, S.M.; Stan, G.E.; Marcov, D.A.; Chiriac, A.; Poeata, I.
2010-01-01
Functionalized implants represent an advanced approaching in implantology, aiming to improve the biointegration and the long-term success of surgical procedures. We report on the synthesis of hydroxyapatite (HA) thin films on polymethylmetacrylate (PMMA) substrates - used as cranio-spinal implant-type structures - by two alternative methods: pulsed laser deposition (PLD) and radio-frequency magnetron sputtering (MS). The deposition parameters were optimized in order to avoid the substrate overheating. Stoichiometric HA structures were obtained by PLD with incident laser fluences of 1.4-2.75 J/cm 2 , pressures of 30-46.66 Pa and 10 Hz pulses repetition rate. The MS depositions were performed at constant pressure of 0.3 Pa in inert and reactive atmospheres. SEM-EDS, XRD, FTIR and pull-out measurements were performed assessing the apatitic-type structure of the prepared films along with their satisfactory mechanical adhesion. Cell viability, proliferation and adhesion tests in osteosarcoma SaOs2 cell cultures were performed to validate the bioactive behaviour of the structures and to select the most favourable deposition regimes. For PLD, this requires a low fluence of 1.4 J/cm 2 , reduced pressure of water vapours and a 100 o C/4 h thermal treatment. For MS, the best results were obtained for 80% Ar + 20% O 2 reactive atmosphere at low RF power (∼75 W). Cells grown on these coatings exhibit behaviour similar to those grown on the standard borosilicate glass control: increased viability, good proliferation, and optimal cell adhesion. In vitro tests proved that HA/PMMA neurosurgical structures prepared by PLD and MS are compatible for the interaction with human bone cells.
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Optimizing chirped laser pulse parameters for electron acceleration in vacuum
Energy Technology Data Exchange (ETDEWEB)
Akhyani, Mina; Jahangiri, Fazel; Niknam, Ali Reza; Massudi, Reza, E-mail: r-massudi@sbu.ac.ir [Laser and Plasma Research Institute, Shahid Beheshti University, Tehran 1983969411 (Iran, Islamic Republic of)
2015-11-14
Electron dynamics in the field of a chirped linearly polarized laser pulse is investigated. Variations of electron energy gain versus chirp parameter, time duration, and initial phase of laser pulse are studied. Based on maximizing laser pulse asymmetry, a numerical optimization procedure is presented, which leads to the elimination of rapid fluctuations of gain versus the chirp parameter. Instead, a smooth variation is observed that considerably reduces the accuracy required for experimentally adjusting the chirp parameter.
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On niobium sputter coated cavities
International Nuclear Information System (INIS)
Arnolds-Mayer, G.; Kaufmann, U.; Downar, H.
1988-01-01
To coat copper cavities with a thin film of niobium, facilities for electropolishing and sputter deposition have been installed at Dornier. Experiments have been performed on samples to optimize electropolishing and deposition parameters. In this paper, characteristics concerning surface properties, adhesion of the niobium film to the copper substrate, and film properties were studied on planar samples. A 1.5 GHz single cell cavity made from oxygen free high conductivity (OFHC) copper was sputter coated twice. First rf measurements were performed in the temperature range from 300 K to 2 K
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International Nuclear Information System (INIS)
Zhang, Lili; Xu, Xue; Wu, Yuejin
2013-01-01
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N + and Ar + ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models
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Measurement of the extinction of sputtered TiO/sub 2/ films
Energy Technology Data Exchange (ETDEWEB)
Welsch, E; Lieder, G; Walther, H G; Hacker, E
1982-05-28
In this paper a method for separate measurement of the extinction of optical thin films is presented. The method combines a laser calorimetric technique and a light-scattering goniophotometer. As an example, the spectral extinction properties of r.f. reactively sputtered TiO/sub 2/ films were measured. Under certain conditions absorption indices of 10/sup -5/ or less can be achieved. Thus light scattering, rather than absorption, is the dominant optical loss mechanism in sputtered TiO/sub 2/ films.
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Energy Technology Data Exchange (ETDEWEB)
Schiller, S; Beister, G; Sieber, W; Schirmer, G; Hacker, E
1981-09-11
We investigated the variations in the structure and optical properties of TiO/sub 2/ films produced by reactive d.c. plasmatron sputtering with the most important deposition parameters. Over a wide range, the phase composition (ratio of rutile to anatase) and the grain size of the TiO/sub 2/ films can be influenced in a controlled manner by variations in the substrate temperature and the oxygen partial pressure. Because of their high refractive index and low light-scattering losses, plasmatron-sputtered TiO/sub 2/ films are of great interest in the field of optical interference coatings, e.g. for dielectric multilayer stacks.
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Multi-parameter sensor based on random fiber lasers
Directory of Open Access Journals (Sweden)
Yanping Xu
2016-09-01
Full Text Available We demonstrate a concept of utilizing random fiber lasers to achieve multi-parameter sensing. The proposed random fiber ring laser consists of an erbium-doped fiber as the gain medium and a random fiber grating as the feedback. The random feedback is effectively realized by a large number of reflections from around 50000 femtosecond laser induced refractive index modulation regions over a 10cm standard single mode fiber. Numerous polarization-dependent spectral filters are formed and superimposed to provide multiple lasing lines with high signal-to-noise ratio up to 40dB, which gives an access for a high-fidelity multi-parameter sensing scheme. The number of sensing parameters can be controlled by the number of the lasing lines via input polarizations and wavelength shifts of each peak can be explored for the simultaneous multi-parameter sensing with one sensing probe. In addition, the random grating induced coupling between core and cladding modes can be potentially used for liquid medical sample sensing in medical diagnostics, biology and remote sensing in hostile environments.
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Measurement of drill grinding parameters using laser sensor
Yanping, Peng; Kumehara, Hiroyuki; Wei, Zhang; Nomura, Takashi
2005-12-01
To measure the grinding parameters and geometry parameters accurately for a drill point is essential to its design and reconditioning. In recent years, a number of non-contact coordinate measuring apparatuses, using CCD camera or laser sensors, are developed. But, a lot work is to be done for further improvement. This paper reports another kind of laser coordinate meter. As an example of its application, the method for geometry inspection of the drill flank surface is detailed. Measured data from laser scanning on the flank surface around some points with several 2-dimensional curves are analyzed with mathematical procedure. If one of these curves turns to be a straight line, it must be the generatrix of the grinding cone. Thus, the grinding parameters are determined by a set of three generatrices. Then, the measurement method and data processing procedure are proposed. Its validity is assessed by measuring a sample with given parameters. The point geometry measured agrees well with the known values. In comparison with other methods in the published literature, it is simpler in computation and more accurate in results.
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Optimal Laser Phototherapy Parameters for Pain Relief.
Kate, Rohit J; Rubatt, Sarah; Enwemeka, Chukuka S; Huddleston, Wendy E
2018-03-27
Studies on laser phototherapy for pain relief have used parameters that vary widely and have reported varying outcomes. The purpose of this study was to determine the optimal parameter ranges of laser phototherapy for pain relief by analyzing data aggregated from existing primary literature. Original studies were gathered from available sources and were screened to meet the pre-established inclusion criteria. The included articles were then subjected to meta-analysis using Cohen's d statistic for determining treatment effect size. From these studies, ranges of the reported parameters that always resulted into large effect sizes were determined. These optimal ranges were evaluated for their accuracy using leave-one-article-out cross-validation procedure. A total of 96 articles met the inclusion criteria for meta-analysis and yielded 232 effect sizes. The average effect size was highly significant: d = +1.36 (confidence interval [95% CI] = 1.04-1.68). Among all the parameters, total energy was found to have the greatest effect on pain relief and had the most prominent optimal ranges of 120-162 and 15.36-20.16 J, which always resulted in large effect sizes. The cross-validation accuracy of the optimal ranges for total energy was 68.57% (95% CI = 53.19-83.97). Fewer and less-prominent optimal ranges were obtained for the energy density and duration parameters. None of the remaining parameters was found to be independently related to pain relief outcomes. The findings of meta-analysis indicate that laser phototherapy is highly effective for pain relief. Based on the analysis of parameters, total energy can be optimized to yield the largest effect on pain relief.
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Meesters, Arne A; Nieboer, Marilin J; Kezic, Sanja; de Rie, Menno A; Wolkerstorfer, Albert
2018-05-07
Efficacy of topical anesthetics can be enhanced by pretreatment of the skin with ablative fractional lasers. However, little is known about the role of parameters such as laser modality and laser density settings in this technique. Aims of this study were to compare the efficacy of pretreatment with two different ablative fractional laser modalities, a CO 2 laser and an Er:YAG laser, and to assess the role of laser density in ablative fractional laser assisted topical anesthesia. In each of 15 healthy subjects, four 10 × 10 mm test regions on the back were randomized to pretreatment (70-75 μm ablation depth) with CO 2 laser at 5% density, CO 2 laser at 15% density, Er:YAG laser at 5% density or Er:YAG laser at 15% density. Articaine hydrochloride 40 mg/ml + epinephrine 10 μg/ml solution was applied under occlusion to all four test regions. After 15 minutes, a pass with the CO 2 laser (1,500 μm ablation depth) was administered as pain stimulus to each test region. A reference pain stimulus was given on unanesthetized skin. The main outcome parameter, pain, was scored on a 0-10 visual analogue scale (VAS) after each pain stimulus. Median VAS scores were 1.50 [CO 2 5%], 0.50 [CO 2 15%], 1.50 [Er:YAG 5%], 0.43 [Er:YAG 15%], and 4.50 [unanesthetized reference]. VAS scores for all pretreated test regions were significantly lower compared to the untreated reference region (P laser pretreated regions. However, VAS scores were significantly lower at 15% density compared to 5% density for both for the CO 2 laser (P laser (P laser was considered slightly more painful than pretreatment with Er:YAG laser by the subjects. Fractional laser assisted topical anesthesia is effective even with very low energy settings and an occlusion time of only 15 minutes. Both the CO 2 laser and the Er:YAG laser can be used to assist topical anesthesia although the CO 2 laser pretreatment is experienced as more painful. In our study settings, using articaine
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Energy Technology Data Exchange (ETDEWEB)
Sagdeo, P R; Shinde, D D; Misal, J S [Optics and Thin Film Laboratory, Autonagar, BARC-Vizag, Visakhapatnam -530012 (India); Kamble, N M; Tokas, R B; Biswas, A; Poswal, A K; Thakur, S; Bhattacharyya, D; Sahoo, N K; Sabharwal, S C, E-mail: nksahoo@barc.gov.i, E-mail: sahoonk@gmail.co [Spectroscopy Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India)
2010-02-03
Titania-silica (TiO{sub 2}/SiO{sub 2}) optical multilayer structures have been conventionally deposited by reactive sputtering of metallic targets. In order to overcome the problems of arcing, target poisoning and low deposition rates encountered there, the application of oxide targets was investigated in this work with asymmetric bipolar pulsed dc magnetron sputtering. In order to evaluate the usefulness of this deposition methodology, an electric field optimized Fabry Perot mirror for He-Cd laser ({lambda} = 441.6 nm) spectroscopy was deposited and characterized. For comparison, this mirror was also deposited by the reactive electron beam (EB) evaporation technique. The mirrors developed by the two complementary techniques were investigated for their microstructural and optical reflection properties invoking atomic force microscopy, ellipsometry, grazing incidence reflectometry and spectrophotometry. From these measurements the layer geometry, optical constants, mass density, topography, surface and interface roughness and disorder parameters were evaluated. The microstructural properties and spectral functional characteristics of the pulsed dc sputtered multilayer mirror were found to be distinctively superior to the EB deposited mirror. The knowledge gathered during this study has been utilized to develop a 21-layer high-pass edge filter for radio photoluminescence dosimetry.
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International Nuclear Information System (INIS)
Sagdeo, P R; Shinde, D D; Misal, J S; Kamble, N M; Tokas, R B; Biswas, A; Poswal, A K; Thakur, S; Bhattacharyya, D; Sahoo, N K; Sabharwal, S C
2010-01-01
Titania-silica (TiO 2 /SiO 2 ) optical multilayer structures have been conventionally deposited by reactive sputtering of metallic targets. In order to overcome the problems of arcing, target poisoning and low deposition rates encountered there, the application of oxide targets was investigated in this work with asymmetric bipolar pulsed dc magnetron sputtering. In order to evaluate the usefulness of this deposition methodology, an electric field optimized Fabry Perot mirror for He-Cd laser (λ = 441.6 nm) spectroscopy was deposited and characterized. For comparison, this mirror was also deposited by the reactive electron beam (EB) evaporation technique. The mirrors developed by the two complementary techniques were investigated for their microstructural and optical reflection properties invoking atomic force microscopy, ellipsometry, grazing incidence reflectometry and spectrophotometry. From these measurements the layer geometry, optical constants, mass density, topography, surface and interface roughness and disorder parameters were evaluated. The microstructural properties and spectral functional characteristics of the pulsed dc sputtered multilayer mirror were found to be distinctively superior to the EB deposited mirror. The knowledge gathered during this study has been utilized to develop a 21-layer high-pass edge filter for radio photoluminescence dosimetry.
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Simple model of surface roughness for binary collision sputtering simulations
Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew
2017-02-01
It has been shown that surface roughness can strongly influence the sputtering yield - especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the "density gradient model") which imitates surface roughness effects. In the model, the target's atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient - leading to increased sputtering yields, similar in effect to surface roughness.
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Sputter coating of microspherical substrates by levitation
Lowe, A.T.; Hosford, C.D.
Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.
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Employment of Some Parameters to Enhance Laser-Drilling of Aluminum
Directory of Open Access Journals (Sweden)
Oday A. Hamadi
2005-06-01
Full Text Available In this work, some parameters affecting drilling of aluminum samples by a pulsed Nd:YAG laser were studied. These parameters are multi-pulses irradiation, controlling sample temperature, low-pressure ambient and application of electric field on the sample. Results presented in this work explained that these parameters can enhance drilling process throughout increasing hole depth in aluminum samples at the same laser energy used for irradiation.
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International Nuclear Information System (INIS)
Tyerman, W.J.R.
1978-01-01
A method is described for preparing a supported catalyst by a sputtering process. A material that is catalytic, or which is a component of a catalytic system, is sputtered on to the surface of refractory oxide particles that are compatible with the sputtered material and the sputtered particles are consolidated into aggregate form. The oxide particles before sputtering should have a diameter in the range 1000A to 50μ and a porosity less than 0.4 ml/g, and may comprise MgO, Al 2 O 3 or SiO 2 or mixtures of these oxides, including hydraulic cement. The particles may possess catalytic activity by themselves or in combination with the catalytic material deposited on them. Sputtering may be effected epitaxially and consolidation may be effected by compaction pelleting, extrusion or spray drying of a slurry. Examples of the use of such catalysts are given. (U.K.)
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Sputtering as a means of depth profiling
International Nuclear Information System (INIS)
Whitton, J.L.
1978-01-01
Probably the most common technique for determination of depth profiles by sputtering is that of secondary ion mass spectrometry. Many problems occur in the important step of converting the time (of sputtering) scale to a depth scale and these problems arise before the secondary ions are ejected. An attempt is made to present a comprehensive list of the effects that should be taken into consideration in the use of sputtering as a means of depth profiling. The various parameters liable to affect the depth profile measurements are listed in four sections: beam conditions; target conditions; experimental environment; and beam-target interactions. The effects are discussed and where interplay occurs, cross-reference is made and examples are provided where possible. (B.R.H.)
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International Nuclear Information System (INIS)
Boyadzhiev, S; Dobrikov, G; Rassovska, M
2008-01-01
Technologies are discussed for preparing and characterizing indium-tin oxide (ITO) thin films with properties appropriate for usage as heat mirrors in solar thermal collectors. The samples were prepared by means of radio frequency (RF) reactive sputtering of indium-tin targets in oxygen. The technological parameters were optimized to obtain films with optimal properties for heat mirrors. The optical properties of the films were studied by visible and infra-red (IR) spectrophotometry and laser ellipsometry. The reflectance of the films in the thermal IR range was investigated by a Fourier transform infra-red (FTIR) spectrophotometer. Heating of the substrates during the sputtering and their post deposition annealing in different environments were also studied. The ultimate purpose of the present research being the development of a technological process leading to low-cost ITO thin films with high transparency in the visible and near IR (0.3-2.4 μm) and high reflection in the thermal IR range (2.5-25 μm), we investigated the correlation of the ITO thin films structural and optical properties with the technological process parameters - target composition and heat treatment
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Extended incident-angle dependence formula of sputter yield
International Nuclear Information System (INIS)
Ono, T.; Shibata, K.; Muramoto, T.; Kenmotsu, T.; Li Z.; Kawamura, T.
2006-06-01
We extend a new semi-empirical formula for incident-angle dependence of normalized sputter yield that includes the contribution to sputter yield from the direct knock-out process that was not considered in the previously proposed one. Three parameters included in the new one are estimated for data calculated with ACAT code for D + ions incident obliquely on C, Fe and W materials in incident-energy regions from several tens of eV to 10 keV. Then, the parameters are expressed with functions of incident energy. The formula with the functions derived well reproduces that using the ACAT data in the whole energy range. (author)
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International Nuclear Information System (INIS)
Lee, Sanghun; Cheon, Dongkeun; Kim, Won-Jeong; Ham, Moon-Ho; Lee, Woong
2012-01-01
Ga-doped ZnO (GZO) transparent conductive oxide (TCO) films were deposited on glass substrates by pulsed DC magnetron sputtering with varying sputtering power and substrate temperature while fixing the Ga concentration in the sputtering target. The application of higher sputtering power by pulsed DC magnetrons sputtering at a moderate temperature of 423 K results in increased carrier concentration and mobility which accompanied improved doping efficiency and crystalline quality. Substrate temperature was found to be the more dominant parameter in controlling the electrical properties and crystallinity, while the sputtering power played synergistic auxiliary roles. Electrical and optical properties of the GZO TCO films fulfilled requirements for transparent electrodes, despite relatively low substrate temperature (423 K) and small thickness (100 nm). In an attempt to improve the electrical properties of the GZO films by hydrogen-treatment, it was observed that the substitutional Ga plays the complex role of carrier generator as donor and carrier suppressor deactivating the oxygen vacancy simultaneously, which would complicate the property improvement by increasing doping efficiency.
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Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide
DEFF Research Database (Denmark)
Stamate, Eugen; Crovetto, Andrea; Sanna, Simone
2016-01-01
Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...
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Simple model of surface roughness for binary collision sputtering simulations
Energy Technology Data Exchange (ETDEWEB)
Lindsey, Sloan J. [Institute of Solid-State Electronics, TU Wien, Floragasse 7, A-1040 Wien (Austria); Hobler, Gerhard, E-mail: gerhard.hobler@tuwien.ac.at [Institute of Solid-State Electronics, TU Wien, Floragasse 7, A-1040 Wien (Austria); Maciążek, Dawid; Postawa, Zbigniew [Institute of Physics, Jagiellonian University, ul. Lojasiewicza 11, 30348 Kraków (Poland)
2017-02-15
Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.
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Simple model of surface roughness for binary collision sputtering simulations
International Nuclear Information System (INIS)
Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew
2017-01-01
Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.
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Nanopatterning of swinging substrates by ion-beam sputtering
Energy Technology Data Exchange (ETDEWEB)
Yoon, Sun Mi; Kim, J.-S., E-mail: jskim@sm.ac.kr [Department of Physics, Sookmyung Women' s University, Seoul 140-742 (Korea, Republic of)
2016-05-28
Graphite substrates are azimuthally swung during ion-beam sputtering (IBS) at a polar angle θ = 78° from the surface normal. The swinging of the substrate not only causes quasi-two-dimensional mass transport but also makes various sputter effects from the different incident angles to work together. Through variation of the swing angle, both the transport and sputtering effects synergistically produce a series of salient patterns, such as asymmetric wall-like structures, which can grow to several tens of nanometers and exhibit a re-entrant orientational change with the increased swing angle. Thus, the present work demonstrates that dynamic variables such as the swing angle, which have been little utilized, offer an additional parameter space that can be exploited to diversify the sputtered patterns, thereby expanding the applicability of an IBS as well as the comprehension of the IBS nano patterning mechanism.
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Nanopatterning of swinging substrates by ion-beam sputtering
International Nuclear Information System (INIS)
Yoon, Sun Mi; Kim, J.-S.
2016-01-01
Graphite substrates are azimuthally swung during ion-beam sputtering (IBS) at a polar angle θ = 78° from the surface normal. The swinging of the substrate not only causes quasi-two-dimensional mass transport but also makes various sputter effects from the different incident angles to work together. Through variation of the swing angle, both the transport and sputtering effects synergistically produce a series of salient patterns, such as asymmetric wall-like structures, which can grow to several tens of nanometers and exhibit a re-entrant orientational change with the increased swing angle. Thus, the present work demonstrates that dynamic variables such as the swing angle, which have been little utilized, offer an additional parameter space that can be exploited to diversify the sputtered patterns, thereby expanding the applicability of an IBS as well as the comprehension of the IBS nano patterning mechanism.
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Parameters in selective laser melting for processing metallic powders
Kurzynowski, Tomasz; Chlebus, Edward; Kuźnicka, Bogumiła; Reiner, Jacek
2012-03-01
The paper presents results of studies on Selective Laser Melting. SLM is an additive manufacturing technology which may be used to process almost all metallic materials in the form of powder. Types of energy emission sources, mainly fiber lasers and/or Nd:YAG laser with similar characteristics and the wavelength of 1,06 - 1,08 microns, are provided primarily for processing metallic powder materials with high absorption of laser radiation. The paper presents results of selected variable parameters (laser power, scanning time, scanning strategy) and fixed parameters such as the protective atmosphere (argon, nitrogen, helium), temperature, type and shape of the powder material. The thematic scope is very broad, so the work was focused on optimizing the process of selective laser micrometallurgy for producing fully dense parts. The density is closely linked with other two conditions: discontinuity of the microstructure (microcracks) and stability (repeatability) of the process. Materials used for the research were stainless steel 316L (AISI), tool steel H13 (AISI), and titanium alloy Ti6Al7Nb (ISO 5832-11). Studies were performed with a scanning electron microscope, a light microscopes, a confocal microscope and a μCT scanner.
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Secondary ion formation during electronic and nuclear sputtering of germanium
Breuer, L.; Ernst, P.; Herder, M.; Meinerzhagen, F.; Bender, M.; Severin, D.; Wucher, A.
2018-06-01
Using a time-of-flight mass spectrometer attached to the UNILAC beamline located at the GSI Helmholtz Centre for Heavy Ion Research, we investigate the formation of secondary ions sputtered from a germanium surface under irradiation by swift heavy ions (SHI) such as 5 MeV/u Au by simultaneously recording the mass spectra of the ejected secondary ions and their neutral counterparts. In these experiments, the sputtered neutral material is post-ionized via single photon absorption from a pulsed, intensive VUV laser. After post-ionization, the instrument cannot distinguish between secondary ions and post-ionized neutrals, so that both signals can be directly compared in order to investigate the ionization probability of different sputtered species. In order to facilitate an in-situ comparison with typical nuclear sputtering conditions, the system is also equipped with a conventional rare gas ion source delivering a 5 keV argon ion beam. For a dynamically sputter cleaned surface, it is found that the ionization probability of Ge atoms and Gen clusters ejected under electronic sputtering conditions is by more than an order of magnitude higher than that measured for keV sputtered particles. In addition, the mass spectra obtained under SHI irradiation show prominent signals of GenOm clusters, which are predominantly detected as positive or negative secondary ions. From the m-distribution for a given Ge nuclearity n, one can deduce that the sputtered material must originate from a germanium oxide matrix with approximate GeO stoichiometry, probably due to residual native oxide patches even at the dynamically cleaned surface. The results clearly demonstrate a fundamental difference between the ejection and ionization mechanisms in both cases, which is interpreted in terms of corresponding model calculations.
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Laser Processing of Multilayered Thermal Spray Coatings: Optimal Processing Parameters
Tewolde, Mahder; Zhang, Tao; Lee, Hwasoo; Sampath, Sanjay; Hwang, David; Longtin, Jon
2017-12-01
Laser processing offers an innovative approach for the fabrication and transformation of a wide range of materials. As a rapid, non-contact, and precision material removal technology, lasers are natural tools to process thermal spray coatings. Recently, a thermoelectric generator (TEG) was fabricated using thermal spray and laser processing. The TEG device represents a multilayer, multimaterial functional thermal spray structure, with laser processing serving an essential role in its fabrication. Several unique challenges are presented when processing such multilayer coatings, and the focus of this work is on the selection of laser processing parameters for optimal feature quality and device performance. A parametric study is carried out using three short-pulse lasers, where laser power, repetition rate and processing speed are varied to determine the laser parameters that result in high-quality features. The resulting laser patterns are characterized using optical and scanning electron microscopy, energy-dispersive x-ray spectroscopy, and electrical isolation tests between patterned regions. The underlying laser interaction and material removal mechanisms that affect the feature quality are discussed. Feature quality was found to improve both by using a multiscanning approach and an optional assist gas of air or nitrogen. Electrically isolated regions were also patterned in a cylindrical test specimen.
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Non-stoichiometry of MoS2 phase prepared by sputtering
International Nuclear Information System (INIS)
Ito, T.; Nakajima, K.
1978-01-01
The lattice parameters and S/Mo atomic ratio in sputtered MoS 2 films have been examined as a function of sputtering conditions, especially the vacuum pressure in the chamber. It was found that the deposited films had a defect MoS 2 structure ranging from 1.6 to 2 in S/Mo ratio, depending on the pressure. (author)
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Reactively sputtered TeOx optical recording media
International Nuclear Information System (INIS)
Di Giulio, M.; Manno, D.; Micocci, G.; Rella, R.; Rizzo, A.; Tepore, A.
1987-01-01
Telluriom suboxide (TeO x ) thin films have been obtained by R.F. reactive sputtering deposition by using a Te target and an Ar-O 2 gas mixture. This technique of preparation has been shown to be a valid method because it is possible to easily obtain films with desired characteristics by an appropriate selection of the deposition conditions. Different samples were prepared by changing both the R.F. power (80-300 Watt) and the oxygen concentration in the sputtering gas. The films were analyzed in order to study their optical characteristics and the morphology before and after heat treatment. In particular, transmissivity and reflectivity have been found to change markedly by thermal treatment and critical temperatures in the range 120-150 grades centigrade. This property makes these films suitable for optical recording with a low output power laser diode
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Inexpensive laser-induced surface modification in bismuth thin films
Energy Technology Data Exchange (ETDEWEB)
Contreras, A. Reyes [Facultad de Ciencias, Universidad Autónoma del Estado de México, Carretera Toluca, Ixtlahuaca Kilómetro 15.5, C.P. 50200 Edo. de México (Mexico); Hautefeuille, M., E-mail: mathieu_h@ciencias.unam.mx [Facultad de Ciencias, Universidad Nacional Autónoma de México, Avenida Universidad 3000, Circuito Exterior S/N, Coyoacán, Ciudad Universitaria, C.P. 04510 D.F. Mexico (Mexico); García, A. Esparza [Fotofísica y Películas Delgadas, Departamento de Tecnociencias, CCADET-UNAM, Circuito exterior s/n C.P. 04510 Cd. Universitaria, D.F. Mexico (Mexico); Mejia, O. Olea [Centro Conjunto de Investigación en Química Sustentable UAEM-UNAM, Carretera Toluca-Atlacomulco, Km 14.5, Unidad El Rosedal, 50200 San Cayetano, Estado de México (Mexico); López, M.A. Camacho [Facultad de Química, Universidad Autónoma del Estado de México, Tollocan s/n, esq. Paseo Colón, Toluca, Estado de México 50110 (Mexico)
2015-05-01
Highlights: • Laser-induced microbumps were formed on bismuth films using a simple, low-cost, laser setup. • The patterns, similar to those typically obtained with high-power lasers, were characterized. • Control of laser ablation conditions is critical in the fabrication of surface microbumps. - Abstract: In this work, we present results on texturing a 500 nm thick bismuth film, deposited by sputtering onto a glass slide using a low-cost homemade, near-infrared pulsed laser platform. A 785 nm laser diode of a CD–DVD pickup head was precisely focused on the sample mounted on a motorized two-axis translation stage to generate localized surface microbumps on the bismuth films. This simple method successfully transferred desired micropatterns on the films in a computer-numerical control fashion. Irradiated zones were characterized by atomic force microscopy and scanning electron microscopy. It was observed that final results are strongly dependent on irradiation parameters.
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Reactively sputtered TeO/sub x/ thin films for optical recording systems
International Nuclear Information System (INIS)
Di Giulio, M.; Micocci, G.; Rella, R.; Tepore, A.
1988-01-01
Tellurium suboxide (TeO/sub x/ ) thin films have been obtained by rf reactive sputtering deposition by using a Te target and an Ar--O 2 gas mixture. Different samples were prepared by changing both the rf power (80--200 W) and the oxygen concentration in the sputtering gas. The transmissivity and the reflectivity of these films change markedly by thermal treatment at critical temperatures in the range 120--150 0 C. This property makes these films suitable for optical disk recording with a low-output power laser diode
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Depth of origin of sputtered atoms: Experimental and theoretical study of Cu/Ru(0001)
International Nuclear Information System (INIS)
Burnett, J.W.; Biersack, J.P.; Gruen, D.M.; Joergensen, B.; Krauss, A.R.; Pellin, M.J.; Schweitzer, E.L.; Yates, J.T. Jr.; Young, C.E.
1987-01-01
The depth of origin of sputtered atoms is a subject of considerable interest. The surface sensitivity of analytical techniques such as Secondary Ion Mass Spectrometry (SIMS) and Surface Analysis by Resonance Ionization of Sputtered Atoms (SARISA), and the sputtering properties of strongly segregating alloy systems, are critically dependent on the sputtering depth of origin. A significant discrepancy exists between the predictions of the Sigmund theory and computer sputtering models; in general, the computer models predict a much shallower depth of origin. The existing experimental evidence suggests that most of the sputtered atoms originate in the topmost atomic layer, but until recently, the results have not been definitive. We have experimentally determined the depth of origin of atoms sputtered from surfaces consisting of Cu films of less than two monolayers on a Ru(0001) substrate. The Cu/Ru target was statically sputtered using 3.6 keV Ar + . The sputtered neutrals were non-resonantly laser ionized and detected using SARISA. The Cu/Ru sputtering yield ratio and the suppression of the Ru sputtering yield were determined for various Cu coverages. The results indicate that the majority of the sputtered atoms originate in the topmost atomic layer. The Cu/Ru system is also modeled using a modified Transport of Ions in Matter (TRIM) code. It was found that TRIM C does not correctly treat the first atomic layer, resulting in a serious underestimate of the number of sputtered atoms which originate in this layer. The corrected version adequately describes the results, predicting that for the experimental conditions roughly two-thirds of the sputtered atoms originate in the first atomic layer. These results are significantly greater than the Sigmund theory estimate of >40%. 26 refs., 3 figs., 1 tab
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International Nuclear Information System (INIS)
Zheng Liping
1998-01-01
Mechanisms affecting multicomponent material sputtering are complex. Isotope sputtering is the simplest in the multicomponent materials sputtering. Although only mass effect plays a dominant role in the isotope sputtering, there is still an isotope puzzle in sputtering by ion bombardment. The major arguments are as follows: (1) At the zero fluence, is the isotope enrichment ejection-angle-independent or ejection-angle-dependent? (2) Is the isotope angular effect the primary or the secondary sputter effect? (3) How to understand the action of momentum asymmetry in collision cascade on the isotope sputtering?
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Plasma properties during magnetron sputtering of lithium phosphorous oxynitride thin films
DEFF Research Database (Denmark)
Christiansen, Ane Sælland; Stamate, Eugen; Thydén, Karl Tor Sune
2015-01-01
The nitrogen dissociation and plasma parameters during radio frequency sputtering of lithium phosphorus oxynitride thin films in nitrogen gas are investigated by mass appearance spectrometry, electrostatic probes and optical emission spectroscopy, and the results are correlated with electrochemical...... properties and microstructure of the films. Low pressure and moderate power are associated with lower plasma density, higher electron temperature, higher plasma potential and larger diffusion length for sputtered particles. This combination of parameters favors the presence of more atomic nitrogen, a fact...
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The crystallization and properties of sputter deposited lithium niobite
Energy Technology Data Exchange (ETDEWEB)
Shank, Joshua C.; Brooks Tellekamp, M.; Alan Doolittle, W., E-mail: alan.doolittle@ece.gatech.edu
2016-06-30
Sputter deposition of the thin film memristor material, lithium niobite (LiNbO{sub 2}) is performed by co-deposition from a lithium oxide (Li{sub 2}O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO{sub 2}. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO{sub 2} films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. - Highlights: • Room temperature sputter deposition of crystalline lithium niobite (LiNbO{sub 2}) • Contrast with previous high temperature corrosive growth methods • Analysis of sputter deposition parameters on the chemical and physical properties of the deposited material.
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The crystallization and properties of sputter deposited lithium niobite
International Nuclear Information System (INIS)
Shank, Joshua C.; Brooks Tellekamp, M.; Alan Doolittle, W.
2016-01-01
Sputter deposition of the thin film memristor material, lithium niobite (LiNbO_2) is performed by co-deposition from a lithium oxide (Li_2O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO_2. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO_2 films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. - Highlights: • Room temperature sputter deposition of crystalline lithium niobite (LiNbO_2) • Contrast with previous high temperature corrosive growth methods • Analysis of sputter deposition parameters on the chemical and physical properties of the deposited material
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Reactive magnetron sputtering model at making Ti-TiOx coatings
International Nuclear Information System (INIS)
Luchkin, A G; Kashapov, N F
2014-01-01
Mathematical model of reactive magnetron sputtering for plant VU 700-D is described. Approximating curves for experimental current-voltage characteristic for two gas input schemas are shown. Choice of gas input schema influences on model parameters (mainly on pumping speed). Reactive magnetron sputtering model allows develop technology of Ti - TiO x coatings deposition without changing atmosphere and pressure in vacuum chamber
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Directory of Open Access Journals (Sweden)
Lamia EL Fissi
2014-12-01
Full Text Available Ten picoseconds (200 kHz ultrafast laser micro-structuring of piezoelectric substrates including AT-cut quartz, Lithium Niobate and Lithium Tantalate have been studied for the purpose of piezoelectric devices application ranging from surface acoustic wave devices, e.g., bandpass filters, to photonic devices such as optical waveguides and holograms. The study examines the impact of changing several laser parameters on the resulting microstructural shapes and morphology. The micromachining rate has been observed to be strongly dependent on the operating parameters, such as the pulse fluence, the scan speed and the scan number. The results specifically indicate that ablation at low fluence and low speed scan tends to form a U-shaped cross-section, while a V-shaped profile can be obtained by using a high fluence and a high scan speed. The evolution of surface morphology revealed that laser pulses overlap in a range around 93% for both Lithium Niobate (LiNbO3 and Lithium Tantalate (LiTaO3 and 98% for AT-cut quartz can help to achieve optimal residual surface roughness.
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Very low pressure high power impulse triggered magnetron sputtering
Anders, Andre; Andersson, Joakim
2013-10-29
A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.
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High power pulsed magnetron sputtering of transparent conducting oxides
International Nuclear Information System (INIS)
Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D.J.
2008-01-01
High power pulsed magnetron sputtering (HPPMS) has been used in order to study the deposition of transparent conducting oxides. We summarize the studies carried out on different materials (indium tin oxide-ITO and aluminium-doped zinc oxide-AZO) using rather different technological approaches, namely sputtering of ceramic targets and reactive sputtering. For the deposition of AZO reactive HPPMS for metallic targets has been used. A feedback control loop has been implemented in order to stabilize the discharge at any given setpoint on the hysteresis curve. The hysteresis was also found to have a rather untypical form. Reactive HPPMS was found to be a promising tool for obtaining high quality films of low total thickness. In the case of ITO deposition a ceramic target has been used. The process has been characterized in terms of its plasma emission and increasing indium ionization was found for higher peak power densities. The properties of the deposited films were compared to DC sputtered films. While for DC sputtering the choice of oxygen addition and shieldings is crucial for determining surface morphology and resistivity, in HPPMS sputtering peak power density has been found to be a good parameter for influencing the crystal structure. The morphologies obtained differ strongly from those seen in DC sputtering. At high power densities films with low surface roughness and excellent resistivity could be deposited without the use of shieldings
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Tombrello, T. A.
1982-01-01
The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.
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Laser direct writing of thin-film copper structures as a modification of lithographic processes
International Nuclear Information System (INIS)
Meyer, F; Ostendorf, A; Stute, U
2007-01-01
This paper presents a flexible, mask-free and efficient technique for UV-laser micropatterning of photosensitive resist by laser direct writing (LDW). Photo resist spun on gold sputtered silicon wafers has been laser structured by a scanner guided 266nm DPSSL and electroplated. Ablation behaviour and optimum seed layer preparation in relation to parameters like pulse energy, scanning speed and number of scanned cycles and the electroplating results are discussed. The resulting adhesive strength was measured by a μ-sear device and the gold seed layer-plated copper interface investigated by SEM and EDX to explain correlation to identified bonding behaviour. Improved adhesive strength was observed with higher laser pulse energy and reduced number of cycle
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International Nuclear Information System (INIS)
Okabe, Yushirou; Sasao, Mamiko; Fujita, Junji; Yamaoka, Hitoshi; Wada, Motoi.
1991-01-01
A method to measure the work function of the target surface in a plasma-sputter-type negative ion source has been developed. The method can determine the work function by measuring the photoelectric current induced by two lasers (He-Ne, Ar + laser). The dependence of Au - production upon the work function of the target surface in the ion source was studied using this method. The time variation of the target work function and Au - production rate were measured during the cesium coverage decrease due to the plasma ion sputtering. The observed minimum work function of a cesiated gold surface in an Ar plasma was 1.3 eV. At the same time, the negative ion production rate (Au - current/target current) took the maximum value. The negative ion production rate indicated the same dependence on the incident ion energy as that of the sputtering rate when the work function was constant. (author)
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Process for the fabrication of aluminum metallized pyrolytic graphite sputtering targets
Makowiecki, Daniel M.; Ramsey, Philip B.; Juntz, Robert S.
1995-01-01
An improved method for fabricating pyrolytic graphite sputtering targets with superior heat transfer ability, longer life, and maximum energy transmission. Anisotropic pyrolytic graphite is contoured and/or segmented to match the erosion profile of the sputter target and then oriented such that the graphite's high thermal conductivity planes are in maximum contact with a thermally conductive metal backing. The graphite contact surface is metallized, using high rate physical vapor deposition (HRPVD), with an aluminum coating and the thermally conductive metal backing is joined to the metallized graphite target by one of four low-temperature bonding methods; liquid-metal casting, powder metallurgy compaction, eutectic brazing, and laser welding.
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Nanoporous zinc oxide films prepared by magnetron sputtering
International Nuclear Information System (INIS)
Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.
2011-01-01
In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.
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Energy Technology Data Exchange (ETDEWEB)
Cumpson, Peter J.; Portoles, Jose F.; Barlow, Anders J.; Sano, Naoko [National EPSRC XPS User' s Service (NEXUS), School of Mechanical and Systems Engineering, Newcastle University, Newcastle upon Tyne, NE1 7RU (United Kingdom)
2013-09-28
Argon Gas Cluster-Ion Beam sources are likely to become widely used on x-ray photoelectron spectroscopy and secondary ion mass spectrometry instruments in the next few years. At typical energies used for sputter depth profiling the average argon atom in the cluster has a kinetic energy comparable with the sputter threshold, meaning that for the first time in practical surface analysis a quantitative model of sputter yields near threshold is needed. We develop a simple equation based on a very simple model. Though greatly simplified it is likely to have realistic limiting behaviour and can be made useful for estimating sputter yields by fitting its three parameters to experimental data. We measure argon cluster-ion sputter yield using a quartz crystal microbalance close to the sputter threshold, for silicon dioxide, poly(methyl methacrylate), and polystyrene and (along with data for gold from the existing literature) perform least-squares fits of our new sputter yield equation to this data. The equation performs well, with smaller residuals than for earlier empirical models, but more importantly it is very easy to use in the design and quantification of sputter depth-profiling experiments.
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Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering
Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.
2015-01-01
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx
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Effect of laser cutting parameters on surface roughness of stainless steel 307
Directory of Open Access Journals (Sweden)
Amal NASSAR
2016-12-01
Full Text Available Optimal parameters of laser cutting are an important step to improve surface quality of cutting edge in the laser cutting of stainless steel 307. This paper presents a new approach for optimizing the cutting parameters on stainless steel. Based on 33 full factorial experimental design, cutting experiments were conducted for stainless steel 307 plates using a laser machine (AMADA FONT 3015. The cutting parameters such as, cutting speed, cutting power and gas pressure are optimized for maximizing surface quality. The results indicated that cutting power and cutting speed play an important role in surface quality.
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Deposition of indium tin oxide films on acrylic substrates by radiofrequency magnetron sputtering
International Nuclear Information System (INIS)
Chiou, B.S.; Hsieh, S.T.; Wu, W.F.
1994-01-01
Indium tin oxide (ITO) films were deposited onto acrylic substrates by rf magnetron sputtering. Low substrate temperature (< 80 C) and low rf power (< 28 W) were maintained during sputtering to prevent acrylic substrate deformation. The influence of sputtering parameters, such as rf power, target-to-substrate distance, and chamber pressure, on the film deposition rate, the electrical properties, as well as the optical properties of the deposited films was investigated. Both the refractive index and the extinction coefficient were derived. The high reflection at wavelengths greater than 3 μm made these sputtered ITO films applicable to infrared mirrors
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Song, Xingliang; Sha, Pengfei; Fan, Yuanyuan; Jiang, R.; Zhao, Jiangshan; Zhou, Yi; Yang, Junhong; Xiong, Guangliang; Wang, Yu
2018-02-01
Due to complex kinetics of formation and loss mechanisms, such as ion-ion recombination reaction, neutral species harpoon reaction, excited state quenching and photon absorption, as well as their interactions, the performance behavior of different laser gas medium parameters for excimer laser varies greatly. Therefore, the effects of gas composition and total gas pressure on excimer laser performance attract continual research studies. In this work, orthogonal experimental design (OED) is used to investigate quantitative and qualitative correlations between output laser energy characteristics and gas medium parameters for an ArF excimer laser with plano-plano optical resonator operation. Optimized output laser energy with good pulse to pulse stability can be obtained effectively by proper selection of the gas medium parameters, which makes the most of the ArF excimer laser device. Simple and efficient method for gas medium optimization is proposed and demonstrated experimentally, which provides a global and systematic solution. By detailed statistical analysis, the significance sequence of relevant parameter factors and the optimized composition for gas medium parameters are obtained. Compared with conventional route of varying single gas parameter factor sequentially, this paper presents a more comprehensive way of considering multivariables simultaneously, which seems promising in striking an appropriate balance among various complicated parameters for power scaling study of an excimer laser.
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Room temperature growth of nanocrystalline anatase TiO2 thin films by dc magnetron sputtering
International Nuclear Information System (INIS)
Singh, Preetam; Kaur, Davinder
2010-01-01
We report, the structural and optical properties of nanocrystalline anatase TiO 2 thin films grown on glass substrate by dc magnetron sputtering at room temperature. The influence of sputtering power and pressure over crystallinity and surface morphology of the films were investigated. It was observed that increase in sputtering power activates the TiO 2 film growth from relative lower surface free energy to higher surface free energy. XRD pattern revealed the change in preferred orientation from (1 0 1) to (0 0 4) with increase in sputtering power, which is accounted for different surface energy associated with different planes. Microstructure of the films also changes from cauliflower type to columnar type structures with increase in sputtering power. FESEM images of films grown at low pressure and low sputtering power showed typical cauliflower like structure. The optical measurement revealed the systematic variation of the optical constants with deposition parameters. The films are highly transparent with transmission higher than 90% with sharp ultraviolet cut off. The transmittance of these films was found to be influenced by the surface roughness and film thickness. The optical band gap was found to decrease with increase in the sputtering power and pressure. The refractive index of the films was found to vary in the range of 2.50-2.24 with increase in sputtering pressure or sputtering power, resulting in the possibility of producing TiO 2 films for device applications with different refractive index, by changing the deposition parameters.
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Directory of Open Access Journals (Sweden)
V. Prajzler
2008-01-01
Full Text Available We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm and also using a semiconductor laser (λex=980 nm. Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm.
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CO 2 laser cutting of MDF . 1. Determination of process parameter settings
Lum, K. C. P.; Ng, S. L.; Black, I.
2000-02-01
This paper details an investigation into the laser processing of medium-density fibreboard (MDF). Part 1 reports on the determination of process parameter settings for the effective cutting of MDF by CO 2 laser, using an established experimental methodology developed to study the interrelationship between and effects of varying laser set-up parameters. Results are presented for both continuous wave (CW) and pulse mode (PM) cutting, and the associated cut quality effects have been commented on.
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Inverse Solutionof BP Neural Network for Laser Ｒemelting Parameters
Directory of Open Access Journals (Sweden)
LIU Li-jun
2017-06-01
Full Text Available Aim at highly nonlinear mapping relationship between the laser processing parameters and the melting cell body’s transverse size，a method of reverse engineering laser melting parameters by back － propagation ( BP neural network was put forward． The model was constructed by BP neural network，and the prediction error was reduced to less than 3% after training for many times． The DIEVAＲ die steel was melted by reverse engineering laser parameters，and the results show that the error was 1． 33% between the transverse dimensions of the melting cell body and the expected，the expected precision can be met well． Thermal fatigue property of the melted and non － melted DIEVAＲ die steel has been studied． The analysis about cracks growth presents that thermal fatigue property of DIEVAＲ die steel melted by the reverse engineering parameters has been greatly improved． The melting cell body could block crack effectively．
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Application of Factorial Design for Gas Parameter Optimization in CO2 Laser Welding
DEFF Research Database (Denmark)
Gong, Hui; Dragsted, Birgitte; Olsen, Flemming Ove
1997-01-01
The effect of different gas process parameters involved in CO2 laser welding has been studied by applying two-set of three-level complete factorial designs. In this work 5 gas parameters, gas type, gas flow rate, gas blowing angle, gas nozzle diameter, gas blowing point-offset, are optimized...... to be a very useful tool for parameter optimi-zation in laser welding process. Keywords: CO2 laser welding, gas parameters, factorial design, Analysis of Variance........ The bead-on-plate welding specimens are evaluated by a number of quality char-acteristics, such as the penetration depth and the seam width. The significance of the gas pa-rameters and their interactions are based on the data found by the Analysis of Variance-ANOVA. This statistic methodology is proven...
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Rf reactive sputtering of indium-tin-oxide films
International Nuclear Information System (INIS)
Tvarozek, V.; Novotny, I.; Harman, R.; Kovac, J.
1986-01-01
Films of indium-tin-oxide (ITO) have been deposited by rf reactive diode sputtering of metallic InSn alloy targets, or ceramic ITO targets, in an Ar and Ar+0 2 atmosphere. Electrical as well as optical properties of ITO films were controlled by varying sputtering parameters and by post-deposition heat-treatment in Ar, H 2 , N 2 , H 2 +N 2 ambients. The ITO films exhibited low resistivity approx. 2 x 10 -4 Ω cm, high transmittance approx. 90% in the visible spectral region and high reflectance approx. 80% in the near infra-red region. (author)
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Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering
Rafieian, Damon; Ogieglo, Wojciech; Savenije, T.J.; Lammertink, Rob G H
2015-01-01
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx), obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, ...
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Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal
International Nuclear Information System (INIS)
Li Dejie
2002-01-01
In film deposition by sputtering, the oxidation and nitrification of the sputtered material lead to degradation of film quality, particularly with respect to metal sulfide films. We propose to use auxiliary sputtering as a method to produce a fresh film of rare-earth metal, usually dysprosium (Dy), that absorbs the active gases in a sputtering system, greatly reducing the background pressure and protecting the film from oxidation and nitrification effectively. The influence of the auxiliary sputtering power consumption, sputtering time, and medium gas pressure on the background pressure in the vacuum chamber is investigated in detail. If the auxiliary sputtering power exceeds 120 W and the sputtering time is more than 4 min, the background pressure is only one fourth of the ultimate pressure pumped by an oil diffusion pump. The absorption activity of the sputtered Dy film continues at least an hour after completion of the auxiliary sputter. Applied to film deposition of Ti and ZnS, this technique has been proven to be effective. For the Ti film, the total content of N and O is reduced from 45% to 20% when the auxiliary sputtering power of Dy is 120 W, and the sputtering time is 20 min. In the case of ZnS, the content of O is reduced from 8% to 2%
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Optimal parameters for laser tissue soldering
McNally-Heintzelman, Karen M.; Sorg, Brian S.; Chan, Eric K.; Welch, Ashley J.; Dawes, Judith M.; Owen, Earl R.
1998-07-01
Variations in laser irradiance, exposure time, solder composition, chromophore type and concentration have led to inconsistencies in published results of laser-solder repair of tissue. To determine optimal parameters for laser tissue soldering, an in vitro study was performed using an 808-nm diode laser in conjunction with an indocyanine green (ICG)- doped albumin protein solder to weld bovine aorta specimens. Liquid and solid protein solders prepared from 25% and 60% bovine serum albumin (BSA), respectively, were compared. The effects of laser irradiance and exposure time on tensile strength of the weld and temperature rise as well as the effect of hydration on bond stability were investigated. Optimum irradiance and exposure times were identified for each solder type. Increasing the BSA concentration from 25% to 60% greatly increased the tensile strength of the weld. A reduction in dye concentration from 2.5 mg/ml to 0.25 mg/ml was also found to result in an increase in tensile strength. The strongest welds were produced with an irradiance of 6.4 W/cm2 for 50 s using a solid protein solder composed of 60% BSA and 0.25 mg/ml ICG. Steady-state solder surface temperatures were observed to reach 85 plus or minus 5 degrees Celsius with a temperature gradient across the solid protein solder strips of between 15 and 20 degrees Celsius. Finally, tensile strength was observed to decrease significantly (20 to 25%) after the first hour of hydration in phosphate-buffered saline. No appreciable change was observed in the strength of the tissue bonds with further hydration.
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Depth resolution and preferential sputtering in depth profiling of sharp interfaces
International Nuclear Information System (INIS)
Hofmann, S.; Han, Y.S.; Wang, J.Y.
2017-01-01
Highlights: • Interfacial depth resolution from MRI model depends on sputtering rate differences. • Depth resolution critically depends on the dominance of roughness or atomic mixing. • True (depth scale) and apparent (time scale) depth resolutions are different. • Average sputtering rate approximately yields true from apparent depth resolution. • Profiles by SIMS and XPS are different but similar to surface concentrations. - Abstract: The influence of preferential sputtering on depth resolution of sputter depth profiles is studied for different sputtering rates of the two components at an A/B interface. Surface concentration and intensity depth profiles on both the sputtering time scale (as measured) and the depth scale are obtained by calculations with an extended Mixing-Roughness-Information depth (MRI)-model. The results show a clear difference for the two extreme cases (a) preponderant roughness and (b) preponderant atomic mixing. In case (a), the interface width on the time scale (Δt(16–84%)) increases with preferential sputtering if the faster sputtering component is on top of the slower sputtering component, but the true resolution on the depth scale (Δz(16–84%)) stays constant. In case (b), the interface width on the time scale stays constant but the true resolution on the depth scale varies with preferential sputtering. For similar order of magnitude of the atomic mixing and the roughness parameters, a transition state between the two extremes is obtained. While the normalized intensity profile of SIMS represents that of the surface concentration, an additional broadening effect is encountered in XPS or AES by the influence of the mean electron escape depth which may even cause an additional matrix effect at the interface.
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Depth resolution and preferential sputtering in depth profiling of sharp interfaces
Energy Technology Data Exchange (ETDEWEB)
Hofmann, S. [Max Planck Institute for Intelligent Systems (formerly MPI for Metals Research), Heisenbergstrasse 3, D-70569 Stuttgart (Germany); Han, Y.S. [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China); Wang, J.Y., E-mail: wangjy@stu.edu.cn [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China)
2017-07-15
Highlights: • Interfacial depth resolution from MRI model depends on sputtering rate differences. • Depth resolution critically depends on the dominance of roughness or atomic mixing. • True (depth scale) and apparent (time scale) depth resolutions are different. • Average sputtering rate approximately yields true from apparent depth resolution. • Profiles by SIMS and XPS are different but similar to surface concentrations. - Abstract: The influence of preferential sputtering on depth resolution of sputter depth profiles is studied for different sputtering rates of the two components at an A/B interface. Surface concentration and intensity depth profiles on both the sputtering time scale (as measured) and the depth scale are obtained by calculations with an extended Mixing-Roughness-Information depth (MRI)-model. The results show a clear difference for the two extreme cases (a) preponderant roughness and (b) preponderant atomic mixing. In case (a), the interface width on the time scale (Δt(16–84%)) increases with preferential sputtering if the faster sputtering component is on top of the slower sputtering component, but the true resolution on the depth scale (Δz(16–84%)) stays constant. In case (b), the interface width on the time scale stays constant but the true resolution on the depth scale varies with preferential sputtering. For similar order of magnitude of the atomic mixing and the roughness parameters, a transition state between the two extremes is obtained. While the normalized intensity profile of SIMS represents that of the surface concentration, an additional broadening effect is encountered in XPS or AES by the influence of the mean electron escape depth which may even cause an additional matrix effect at the interface.
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Optimization of the fiber laser parameters for local high-temperature impact on metal
Yatsko, Dmitrii S.; Polonik, Marina V.; Dudko, Olga V.
2016-11-01
This paper presents the local laser heating process of surface layer of the metal sample. The aim is to create the molten pool with the required depth by laser thermal treatment. During the heating the metal temperature at any point of the molten zone should not reach the boiling point of the main material. The laser power, exposure time and the spot size of a laser beam are selected as the variable parameters. The mathematical model for heat transfer in a semi-infinite body, applicable to finite slab, is used for preliminary theoretical estimation of acceptable parameters values of the laser thermal treatment. The optimization problem is solved by using an algorithm based on the scanning method of the search space (the zero-order method of conditional optimization). The calculated values of the parameters (the optimal set of "laser radiation power - exposure time - spot radius") are used to conduct a series of natural experiments to obtain a molten pool with the required depth. A two-stage experiment consists of: a local laser treatment of metal plate (steel) and then the examination of the microsection of the laser irradiated region. According to the experimental results, we can judge the adequacy of the ongoing calculations within the selected models.
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International Nuclear Information System (INIS)
Johnson, R.E.
1989-01-01
Electronic sputtering covers a range of phenomena from electron and photon stimulated desorption from multilayers to fast heavy ion-induced desorption (sputtering) of biomolecules. In this talk the author attempted. Therefore, to connect the detailed studies of argon ejection from solid argon by MeV ions and keV electrons to the sputtering of low temperatures molecular ices by MeV ions then to biomolecule ejection from organic solids. These are related via changing (dE/dx) e , molecular size, and transport processes occurring in materials. In this regard three distinct regions of (dE/dx) e have been identified. Since the talk this picture has been made explicit using a simple spike model for individual impulsive events in which spike interactions are combined linearly. Since that time also the molecular dynamics programs (at Virginia and Uppsala) have quantified both single atom and dimer processes in solid Ar and the momentum transport in large biomolecule sputtering. 5 refs
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Mahieu, Stijn
2008-01-01
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
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Czech Academy of Sciences Publication Activity Database
Suchaneck, G.; Labitzke, R.; Adolphi, B.; Jastrabík, Lubomír; Adámek, Petr; Drahokoupil, Jan; Hubička, Zdeněk; Kiselev, D.A.; Kholkin, A. L.; Gerlach, G.; Dejneka, Alexandr
2011-01-01
Roč. 205, č. 2 (2011), S241-S244 ISSN 0257-8972 R&D Projects: GA ČR GC202/09/J017; GA AV ČR KAN301370701; GA MŠk(CZ) 1M06002 Institutional research plan: CEZ:AV0Z10100522 Keywords : pulsed DC reactive sputtering * RF reactive sputtering * complex oxide film deposition * polymer substrate Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.867, year: 2011
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Room temperature growth of nanocrystalline anatase TiO{sub 2} thin films by dc magnetron sputtering
Energy Technology Data Exchange (ETDEWEB)
Singh, Preetam, E-mail: preetamphy@gmail.co [Functional Nanomaterials Research Lab, Department of Physics and Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Kaur, Davinder [Functional Nanomaterials Research Lab, Department of Physics and Centre of Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667 (India)
2010-03-01
We report, the structural and optical properties of nanocrystalline anatase TiO{sub 2} thin films grown on glass substrate by dc magnetron sputtering at room temperature. The influence of sputtering power and pressure over crystallinity and surface morphology of the films were investigated. It was observed that increase in sputtering power activates the TiO{sub 2} film growth from relative lower surface free energy to higher surface free energy. XRD pattern revealed the change in preferred orientation from (1 0 1) to (0 0 4) with increase in sputtering power, which is accounted for different surface energy associated with different planes. Microstructure of the films also changes from cauliflower type to columnar type structures with increase in sputtering power. FESEM images of films grown at low pressure and low sputtering power showed typical cauliflower like structure. The optical measurement revealed the systematic variation of the optical constants with deposition parameters. The films are highly transparent with transmission higher than 90% with sharp ultraviolet cut off. The transmittance of these films was found to be influenced by the surface roughness and film thickness. The optical band gap was found to decrease with increase in the sputtering power and pressure. The refractive index of the films was found to vary in the range of 2.50-2.24 with increase in sputtering pressure or sputtering power, resulting in the possibility of producing TiO{sub 2} films for device applications with different refractive index, by changing the deposition parameters.
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Comparison on electrically pumped random laser actions of hydrothermal and sputtered ZnO films
International Nuclear Information System (INIS)
Wang, Canxing; Jiang, Haotian; Li, Yunpeng; Ma, Xiangyang; Yang, Deren
2013-01-01
Random lasing (RL) in polycrystalline ZnO films is an intriguing research subject. Here, we have comparatively investigated electrically pumped RL behaviors of two metal-insulator-semiconductor structured devices using the hydrothermal and sputtered ZnO films as the semiconductor components, i.e., the light-emitting layers, respectively. It is demonstrated that the device using the hydrothermal ZnO film exhibits smaller threshold current and larger output optical power of the electrically pumped RL. The morphological characterization shows that the hydrothermal ZnO film is somewhat porous and is much rougher than the sputtered one, suggesting that in the former stronger multiple light scattering can occur. Moreover, the photoluminescence characterization indicates that there are fewer defects in the hydrothermal ZnO film than in the sputtered one, which means that the photons can pick up larger optical gain through stimulated emission in the hydrothermal ZnO film. Therefore, it is believed that the stronger multiple light scattering and larger optical gain contribute to the improved performance of the electrically pumped RL from the device using the hydrothermal ZnO film
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Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidence
International Nuclear Information System (INIS)
Yamamura, Yasunori; Tawara, Hiro.
1995-03-01
The yields of the ion-induced sputtering from monoatomic solids at normal incidence for various ion-target combinations are presented graphically as a function of the incident ion energy. In order to fill the lack of the experimental data, the sputtering yields are also calculated by the Monte Carlo simulation code ACAT for some ion-target combinations. Each graph shows available experimental data points and the ACAT data, together with the sputtering yields calculated by the present empirical formula, whose parameters are determined by the best-fit to available data. (author)
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Microfiber Bragg grating hydrogen sensor base on co-sputtered Pd/Ni composite film
Wang, Gaopeng; Yang, Minghong; Dai, Jixiang; Cheng, Cheng; Yuan, Yinqian
2015-07-01
A novel hydrogen sensor based on Pd/Ni co-sputtered coating on micro fiber Bragg grating (MFBG) is proposed and experimentally demonstrated. The microfiber is stretched uniformly and the Bragg grating is directly inscribed on the microfiber without hydrogen loading using 193 nm ArF excimer laser and a phase mask. Palladium and nickel coatings are co-sputtered on the micro fiber Bragg grating for hydrogen sensing. The MFBG hydrogen sensors are characterized concerning their response to the hydrogen, ambient temperature and ambient refractive index, respectively. The performance of the proposed MFBG hydrogen sensor is obviously enhanced, especially when compared to standard FBG hydrogen sensors.
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International Nuclear Information System (INIS)
Brooks, J.N.; Ruzic, D.N.
1990-01-01
The microstructure of the redeposited surface in tokamaks may affect sputtering and reflection properties and subsequent particle transport. This subject has been studied numerically using coupled models/codes for near-surface plasma particle kinetic transport (WBC code) and rough surface sputtering (fractal-TRIM). The coupled codes provide an overall Monte Carlo calculation of the sputtering cascade resulting from an initial flux of hydrogen ions. Beryllium, carbon, and tungsten surfaces are analyzed for typical high recycling, oblique magnetic field, divertor conditions. Significant variations in computed sputtering rates are found with surface roughness. Beryllium exhibits high D-T and self-sputtering coefficients for the plasma regime studied (T e = 30-75 eV). Carbon and tungsten sputtering is significantly lower. 9 refs., 6 figs., 1 tab
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Arc generation from sputtering plasma-dielectric inclusion interactions
International Nuclear Information System (INIS)
Wickersham, C.E. Jr.; Poole, J.E.; Fan, J.S.
2002-01-01
Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al 2 O 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect density, and the intensity of the optical emission from the arcing plasma indicates that the critical aluminum oxide inclusion area for arcing is 0.22±0.1 mm2 when the sputtering plasma sheath dark-space λ d , is 0.51 mm. Inclusions with areas greater than this critical value readily induce arcing and macroparticle ejection during sputtering. Inclusions below this critical size do not cause arcing or macroparticle ejection. When the inclusion major axis is longer than 2λ d and lies perpendicular to the sputter erosion track tangent, the arcing activity increases significantly over the case where the inclusion major axis lies parallel to the erosion track tangent
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Fundamental aspects of cathodic sputtering
International Nuclear Information System (INIS)
Harman, R.
1979-01-01
The main fundamental aspects and problems of cathodic sputtering used mainly for thin film deposition and sputter etching are discussed. Among many types of known sputtering techniques the radiofrequency /RF/ diode sputtering is the most universal one and is used for deposition of metals, alloys, metallic compounds, semiconductors and insulators. It seems that nowadays the largest number of working sputtering systems is of diode type. Sometimes also the dc or rf triode sputtering systems are used. The problems in these processes are practically equivalent and comparable with the problems in the diode method and therefore our discussion will be, in most cases applicable for both, the diode and triode methods
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Effect of laser pulse shaping parameters on the fidelity of quantum logic gates.
Zaari, Ryan R; Brown, Alex
2012-09-14
The effect of varying parameters specific to laser pulse shaping instruments on resulting fidelities for the ACNOT(1), NOT(2), and Hadamard(2) quantum logic gates are studied for the diatomic molecule (12)C(16)O. These parameters include varying the frequency resolution, adjusting the number of frequency components and also varying the amplitude and phase at each frequency component. A time domain analytic form of the original discretized frequency domain laser pulse function is derived, providing a useful means to infer the resulting pulse shape through variations to the aforementioned parameters. We show that amplitude variation at each frequency component is a crucial requirement for optimal laser pulse shaping, whereas phase variation provides minimal contribution. We also show that high fidelity laser pulses are dependent upon the frequency resolution and increasing the number of frequency components provides only a small incremental improvement to quantum gate fidelity. Analysis through use of the pulse area theorem confirms the resulting population dynamics for one or two frequency high fidelity laser pulses and implies similar dynamics for more complex laser pulse shapes. The ability to produce high fidelity laser pulses that provide both population control and global phase alignment is attributed greatly to the natural evolution phase alignment of the qubits involved within the quantum logic gate operation.
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International Nuclear Information System (INIS)
Bai, Peikang; Hu, Shengliang; Zhang, Taiping; Sun, Jing; Cao, Shirui
2010-01-01
The size of nanodiamonds formed upon laser irradiation could be easily controlled over simply adjusting laser pulse parameters. The stable size and structure of nanodiamonds were mostly determined by laser power density and pulse width. Both large nanodiamonds with multiply twinning structure (MTS) and small nanodiamonds with single crystalline structure (SCS) emitted strong visible light after surface passivation, and their fluorescence quantum yield (QY) was 4.6% and 7.1%, respectively.
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Energy Technology Data Exchange (ETDEWEB)
Bai, Peikang [School of Materials Science and Engineering, North University of China, Taiyuan 030051 (China); Hu, Shengliang, E-mail: hsliang@yeah.net [Key Laboratory of Instrumentation Science and Dynamic Measurement (North University of China), Ministry of Education, National Key Laboratory Science and Technology on Electronic Test and Measurement, Taiyuan 030051 (China); School of Materials Science and Engineering, North University of China, Taiyuan 030051 (China); Zhang, Taiping; Sun, Jing [School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China); Cao, Shirui [School of Materials Science and Engineering, North University of China, Taiyuan 030051 (China)
2010-07-15
The size of nanodiamonds formed upon laser irradiation could be easily controlled over simply adjusting laser pulse parameters. The stable size and structure of nanodiamonds were mostly determined by laser power density and pulse width. Both large nanodiamonds with multiply twinning structure (MTS) and small nanodiamonds with single crystalline structure (SCS) emitted strong visible light after surface passivation, and their fluorescence quantum yield (QY) was 4.6% and 7.1%, respectively.
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C60 ion sputtering of layered organic materials
International Nuclear Information System (INIS)
Shard, Alexander G.; Green, Felicia M.; Gilmore, Ian S.
2008-01-01
Two different organic materials, Irganox1010 and Irganox3114, were vacuum deposited as alternating layers. The layers of Irganox3114 were thin (∼2.5 nm) in comparison to the Irganox1010 (∼55 or ∼90 nm); we call these 'organic delta layers'. Both materials are shown to have identical sputtering yields and the alternating layers may be used to determine some of the important metrological parameters for cluster ion beam depth profiling of organic materials. The sputtering yield for C 60 ions is shown to diminish with ion dose. Comparison with atomic force microscopy data from films of pure Irganox1010, demonstrates that the depth resolution is limited by the development of topography. Secondary ion intensities are a well-behaved function of sputtering yield and may be employed to obtain useful analytical information. Organic delta layers are shown to be valuable reference materials for comparing the capabilities of different cluster ion sources and experimental arrangements for the depth profiling of organic materials.
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Preparation and characterization of thick metastable sputter deposits
International Nuclear Information System (INIS)
Allen, R.P.; Dahlgren, S.D.; Merz, M.D.
1975-01-01
High-rate dc supported-discharge sputtering techniques were developed and used to prepare 0.1 mm to 5.0 mm-thick deposits of a variety of metastable materials including amorphous alloys representing more than 15 different rare-earth-transition metal systems and a wide range of compositions and deposition conditions. The ability to prepare thick, homogeneous deposits has made it possible for the first time to investigate the structure, properties, and annealing behavior of these unique sputtered alloys using neutron diffraction, ultrasonic, and other experimental techniques that are difficult or impractical for thin films. More importantly, these characterization studies show that the structure and properties of the massive sputter deposits are independent of thickness and can be reproduced from deposit to deposit. Other advantages and applications of this metastable materials preparation technique include the possibility of varying structure and properties by control of the deposition parameters and the ability to deposit even reactive alloys with a very low impurity content
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Arc generation from sputtering plasma-dielectric inclusion interactions
Wickersham, C E J; Fan, J S
2002-01-01
Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al sub 2 O sub 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect...
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Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering
Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.
2015-01-01
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to
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International Nuclear Information System (INIS)
Smith, M.R.; Alexander, M.L.; Hartman, J.S.; Koppenaal, D.W.
1996-01-01
Inductively coupled plasma mass spectrometry is used to investigate the influence of laser parameters with regard to sampling complex matrices ranging from relatively homogenous glasses to multi-phase sludge/slurry materials including radioactive Hanford tank waste. The resulting plume composition caused by the pulsed laser is evaluated as a function of wavelength, pulse energy, pulse length, focus, and beam power profiles. The author's studies indicate that these parameters play varying and often synergistic roles regarding quantitative results. (In a companion paper, particle transport and size distribution studies are presented.) The work described here will illustrate other laser parameters such as focusing and consequently power density and beam power profiles which are shown to influence precision and accuracy. Representative sampling by the LA approach is largely dependent on the sample's optical properties as well as laser parameters. Experimental results indicate that optimal laser parameters; short wavelength (UV), relatively low power (300 mJ), low-to-sub ns pulse lengths, and laser beams with reasonable power distributions (i.e., Gaussian or top-hat beam profiles) provide superior precision and accuracy. Remote LA-ICP/MS analyses of radioactive sludges are used to illustrate these optimal conditions laser ablation sampling
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Torrisi, Lorenzo
2018-01-01
Measurements of ion acceleration in plasma produced by fs lasers at intensity of the order of 1018 W/cm2 have been performed in different European laboratories. The forward emission in target-normal-sheath-acceleration (TNSA) regime indicated that the maximum energy is a function of the laser parameters, of the irradiation conditions and of the target properties.In particular the laser intensity and contrast play an important role to maximize the ion acceleration enhancing the conversion efficiency. Also the use of suitable prepulses, focal distances and polarized laser light has important roles. Finally the target composition, surface, geometry and multilayered structure, permit to enhance the electric field driving the forward ion acceleration.Experimental measurements will be reported and discussed.
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Influence of sputtering power on the optical properties of ITO thin films
Energy Technology Data Exchange (ETDEWEB)
K, Aijo John; M, Deepak, E-mail: manju.thankamoni@gmail.com; T, Manju, E-mail: manju.thankamoni@gmail.com [Department of Physics, Sree Sankara College, Kalady P. O., Ernakulam Dist., Kerala (India); Kumar, Vineetha V. [Dept. of Physics, K. E. College, Mannanam, Kottayam Dist., Kerala (India)
2014-10-15
Tin doped indium oxide films are widely used in transparent conducting coatings such as flat panel displays, crystal displays and in optical devices such as solar cells and organic light emitting diodes due to the high electrical resistivity and optical transparency in the visible region of solar spectrum. The deposition parameters have a commendable influence on the optical and electrical properties of the thin films. In this study, ITO thin films were prepared by RF magnetron sputtering. The properties of the films prepared under varying sputtering power were compared using UV- visible spectrophotometry. Effect of sputtering power on the energy band gap, absorption coefficient and refractive index are investigated.
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Multi-Parameter Measurement in Unseeded Flows using Femtosecond Lasers
National Aeronautics and Space Administration — Our approach is to use new turn-key femtosecond laser technology along with new high-speed CMOS camera technology to build a multi-parameter measurement system based...
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Influence of the atomic structure on the quantum state of sputtered Ir atoms
International Nuclear Information System (INIS)
Bastiaansen, J.; Philipsen, V.; Lievens, P.; Silverans, R.E.; Vandeweert, E.
2004-01-01
The probability of the ejection of a neutral atom in a specific quantum state after keV-ion beam sputtering is often interpreted in terms of the interaction between the atomic states of the escaping atom and the electronic states of the solid. In this work, we examined this interplay in the sputtering of iridium as this element has--unlike the elements employed in previous investigations--a complex atomic structure due to strong configuration interactions. Double-resonant two-photon laser ionization is used to probe the sputtered Ir atoms yielding information about the probability for an ejected atom to populate a specific atomic state and its escape velocity. The qualitative features of the corresponding population partition and state-selective velocity distributions show the influence of the excitation energy and the electronic structure of the different atomic states. A comparison is made between the experimental data and predictions from the resonant electron transfer description
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Characterization of Niobium Oxide Films Deposited by High Target Utilization Sputter Sources
International Nuclear Information System (INIS)
Chow, R; Ellis, A D; Loomis, G E; Rana, S I
2007-01-01
High quality, refractory metal, oxide coatings are required in a variety of applications such as laser optics, micro-electronic insulating layers, nano-device structures, electro-optic multilayers, sensors and corrosion barriers. A common oxide deposition technique is reactive sputtering because the kinetic mechanism vaporizes almost any solid material in vacuum. Also, the sputtered molecules have higher energies than those generated from thermal evaporation, and so the condensates are smoother and denser than those from thermally-evaporated films. In the typical sputtering system, target erosion is a factor that drives machine availability. In some situations such as nano-layered capacitors, where the device's performance characteristics depends on thick layers, target life becomes a limiting factor on the maximizing device functionality. The keen interest to increase target utilization in sputtering has been addressed in a variety of ways such as target geometry, rotating magnets, and/or shaped magnet arrays. Also, a recent sputtering system has been developed that generates a high density plasma, directs the plasma beam towards the target in a uniform fashion, and erodes the target in a uniform fashion. The purpose of this paper is to characterize and compare niobia films deposited by two types of high target utilization sputtering sources, a rotating magnetron and a high density plasma source. The oxide of interest in this study is niobia because of its high refractive index. The quality of the niobia films were characterized spectroscopically in optical transmission, ellipsometrically, and chemical stoichiometry with X-ray photo-electron spectroscopy. The refractive index, extinction coefficients, Cauchy constants were derived from the ellipsometric modeling. The mechanical properties of coating density and stress are also determined
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International Nuclear Information System (INIS)
Pallix, J.B.; Becker, C.H.; Missert, N.; Char, K.; Hammond, R.H.
1988-01-01
Surface analysis by laser ionization (SALI) has been used to examine a high-T/sub c/ superconducting thin film of nominal composition YBa 2 Cu 3 O 7 deposited on SrTiO 3 (100) by reactive magnetron sputtering. The main focus of this work was to probe the compositional uniformity and the impurity content throughout the 1800 A thick film having critical current densities of 1 to 2 x 10 6 A/cm 2 . SALI depth profiles show this film to be more uniform than thicker films (∼1 μm, prepared by electron beam codeposition) which were studied previously, yet the data show that some additional (non-superconducting) phases derived from Y, Ba, Cu, and O are still present. These additional phases are studied by monitoring the atomic and diatomic-oxide photoion profiles and also the depth profiles of various clusters (e.g. Y 2 O 2 + , Y 2 O 3 + , Y 3 O 4 + , Ba 2 O + , Ba 2 O 2 + , BaCu + , BaCuO + , YBaO 2 + , YSrO 2 + , etc.). A variety of impurities are observed to occur throughout the film including rather large concentrations of Sr. Hydroxides, F, Cl, and CO/sub x/ are evident particularly in the sample's near surface region (the top ∼100 A)
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Pallix, J. B.; Becker, C. H.; Missert, N.; Char, K.; Hammond, R. H.
1988-02-01
Surface analysis by laser ionization (SALI) has been used to examine a high-Tc superconducting thin film of nominal composition YBa2Cu3O7 deposited on SrTiO3 (100) by reactive magnetron sputtering. The main focus of this work was to probe the compositional uniformity and the impurity content throughout the 1800 Å thick film having critical current densities of 1 to 2×106 A/cm2. SALI depth profiles show this film to be more uniform than thicker films (˜1 μm, prepared by electron beam codeposition) which were studied previously, yet the data show that some additional (non-superconducting) phases derived from Y, Ba, Cu, and O are still present. These additional phases are studied by monitoring the atomic and diatomic-oxide photoion profiles and also the depth profiles of various clusters (e.g. Y2O2+, Y2O3+, Y3O4+, Ba2O+, Ba2O2+, BaCu+, BaCuO+, YBaO2+, YSrO2+, etc.). A variety of impurities are observed to occur throughout the film including rather large concentrations of Sr. Hydroxides, F, Cl, and COx are evident particularly in the sample's near surface region (the top ˜100 Å).
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Investigation of Laser Welding of Ti Alloys for Cognitive Process Parameters Selection
Directory of Open Access Journals (Sweden)
Fabrizia Caiazzo
2018-04-01
Full Text Available Laser welding of titanium alloys is attracting increasing interest as an alternative to traditional joining techniques for industrial applications, with particular reference to the aerospace sector, where welded assemblies allow for the reduction of the buy-to-fly ratio, compared to other traditional mechanical joining techniques. In this research work, an investigation on laser welding of Ti–6Al–4V alloy plates is carried out through an experimental testing campaign, under different process conditions, in order to perform a characterization of the produced weld bead geometry, with the final aim of developing a cognitive methodology able to support decision-making about the selection of the suitable laser welding process parameters. The methodology is based on the employment of artificial neural networks able to identify correlations between the laser welding process parameters, with particular reference to the laser power, welding speed and defocusing distance, and the weld bead geometric features, on the basis of the collected experimental data.
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Investigation of Laser Welding of Ti Alloys for Cognitive Process Parameters Selection.
Caiazzo, Fabrizia; Caggiano, Alessandra
2018-04-20
Laser welding of titanium alloys is attracting increasing interest as an alternative to traditional joining techniques for industrial applications, with particular reference to the aerospace sector, where welded assemblies allow for the reduction of the buy-to-fly ratio, compared to other traditional mechanical joining techniques. In this research work, an investigation on laser welding of Ti⁻6Al⁻4V alloy plates is carried out through an experimental testing campaign, under different process conditions, in order to perform a characterization of the produced weld bead geometry, with the final aim of developing a cognitive methodology able to support decision-making about the selection of the suitable laser welding process parameters. The methodology is based on the employment of artificial neural networks able to identify correlations between the laser welding process parameters, with particular reference to the laser power, welding speed and defocusing distance, and the weld bead geometric features, on the basis of the collected experimental data.
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Energy Technology Data Exchange (ETDEWEB)
Afshar, Maziar, E-mail: m.afshar@lmm.uni-saarland.de [Lab for Micromechanics, Microfluidics, and Microactuators, Saarland University, Saarbrücken D-66123 (Germany); Leber, Moritz [Lab for Micromechanics, Microfluidics, and Microactuators, Saarland University, Saarbrücken D-66123 (Germany); Poppendieck, Wigand [Department of Medical Engineering & Neuroprosthetics, Fraunhofer Institute for Biomedical Engineering, St. Ingbert D-66386 (Germany); König, Karsten [Lab for Biophotonics and Laser Technology, Saarland University, Saarbrücken D-66123 (Germany); Seidel, Helmut; Feili, Dara [Lab for Micromechanics, Microfluidics, and Microactuators, Saarland University, Saarbrücken D-66123 (Germany)
2016-01-01
Graphical abstract: - Highlights: • A novel method to make sub-20 nm nanopatterning in ITO thin films by laser writing. • A novel way to functionalize ITO bio-electrodes to yield near-field polarizing feature. • A basic characterization of ITO electrodes was performed by impedance spectroscopy. • Presentation of simulations and possible theoretical approaches to explain the results. - Abstract: In this work, the effect of laser-induced nanostructuring of transparent indium tin oxide (ITO) electrodes on flexible glass is investigated. Multi-electrode arrays (MEA) for electrical and optical characterization of biological cells were fabricated using standard MEMS technologies. Optimal sputter parameters concerning oxygen flow, sputter power and ambient pressure for ITO layers with both good optical and electrical properties were determined. Afterwards, coherent sub-20 nm wide and 150 nm deep nanocuts of many micrometers in length were generated within the ITO electrodes by a sub-15 femtosecond (fs) pulsed laser. The influence of laser processing on the electrical and optical properties of electrodes was investigated. The electrochemical impedance of the manufactured electrodes was measured before and after laser modification using electrochemical impedance spectroscopy. A small reduction in electrode impedance was observed. These nanostructured electrodes show also polarizing effects by the visible spectrum.
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Agapovichev, A. V.; Knyazeva, A. G.; Smelov, V. G.
2017-10-01
A large number of factors influence the quality of the material obtained with selective laser melting. Through correct understanding and managing these factors, it is possible to achieve the necessary quality of the materials, which is highly competitive to the traditional production methods. The technique of selective laser melting is a complex process in which a large number of parameters affect the quality of the final product. The complexity of the process of selective laser melting consists of many thermal, physical and chemical interactions, which are influenced by a large number of parameters. The main parameters of SLM are scanning rate, laser radiation power and layer thickness. In the framework of this paper, there was made an attempt to take into account real physical and chemical processes taking place during the selective laser melting of an Ni-Al alloy.
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Geometric considerations in magnetron sputtering
International Nuclear Information System (INIS)
Thornton, J.A.
1982-01-01
The recent development of high performance magnetron type discharge sources has greatly enhaced the range of coating applications where sputtering is a viable deposition process. Magnetron sources can provide high current densities and sputtering rates, even at low pressures. They have much reduced substrate heating rates and can be scaled to large sizes. Magnetron sputter coating apparatuses can have a variety of geometric and plasma configurations. The target geometry affects the emission directions of both the sputtered atoms and the energetic ions which are neutralized and reflected at the cathode. This fact, coupled with the long mean free particle paths which are prevalent at low pressures, can make the coating properties very dependent on the apparatus geometry. This paper reviews the physics of magnetron operation and discusses the influences of apparatus geometry on the use of magnetrons for rf sputtering and reactive sputtering, as well as on the microstructure and internal stresses in sputtered metallic coatings. (author) [pt
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Measurement of the main and critical parameters for optimal laser treatment of heart disease
Kabeya, FB; Abrahamse, H.; Karsten, AE
2017-10-01
Laser light is frequently used in the diagnosis and treatment of patients. As in traditional treatments such as medication, bypass surgery, and minimally invasive ways, laser treatment can also fail and present serious side effects. The true reason for laser treatment failure or the side effects thereof, remains unknown. From the literature review conducted, and experimental results generated we conclude that an optimal laser treatment for coronary artery disease (named heart disease) can be obtained if certain critical parameters are correctly measured and understood. These parameters include the laser power, the laser beam profile, the fluence rate, the treatment time, as well as the absorption and scattering coefficients of the target treatment tissue. Therefore, this paper proposes different, accurate methods for the measurement of these critical parameters to determine the optimal laser treatment of heart disease with a minimal risk of side effects. The results from the measurement of absorption and scattering properties can be used in a computer simulation package to predict the fluence rate. The computing technique is a program based on the random number (Monte Carlo) process and probability statistics to track the propagation of photons through a biological tissue.
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Arc-discharge and magnetron sputtering combined equipment for nanocomposite coating deposition
International Nuclear Information System (INIS)
Koval, N.N.; Borisov, D.P.; Savostikov, V.M.
2005-01-01
It is known that characteristics of nanocomposite coatings produced by reactive magnetron sputtering undergo an essential influence on the following parameters such as original component composition of targets being sputtered, as well as abundance ratio of such components in the coatings deposited, relative content of inert and reactionary gases in a gas mixture used and a value of operating pressure in a chamber, substrate temperature, and a value of substrate bias potential, determining energy of ionized atoms, ionized atoms flow density, i.e. ion current density on a substrate. The multifactor character of production process of nanocomposite coatings with certain physical and mechanical properties demands a purposeful and complex control on all above-mentioned parameters. To solve such a problem, an arc-discharge and magnetron sputtering combined equipment including a vacuum chamber of approximately ∼ 0.5 m 3 with a built-in low-pressure plasma generator made on the basis of non-self-sustained discharge with a thermal cathode and a planar magnetron combined with two sputtered targets has been created. Construction of such a complex set-up provides both an autonomous mode of operation and simultaneous operation of an arc plasma generator and magnetron sputtering system. Magnetron sputtering of either one or two targets simultaneously is provided as well. An arc plasma generator enables ions current density control on a substrate in a wide range due to discharge current varying from 1 to 100 A. Energy of ions is also being controlled in a wide range by a negative bias potential from 0 to 1000 V applied to a substrate. The wide control range of gas plasma density of a arc discharge of approximately 10 9 -10 11 cm -3 and high uniformity of its distribution over the total volume of an operating chamber (about 15% error with regard to the mean value) provides a purposeful and simultaneous control either of magnetron discharge characteristics (operating pressure of
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Laser shock peening of Ti-17 titanium alloy: Influence of process parameters
Energy Technology Data Exchange (ETDEWEB)
Cellard, C.; Retraint, D.; Francois, M. [University of Technology of Troyes (UTT), Charles Delaunay Institute, LASMIS, UMR CNRS 6279, 12 Rue Marie Curie, BP2060, 10010 Troyes Cedex (France); Rouhaud, E., E-mail: rouhaud@utt.fr [University of Technology of Troyes (UTT), Charles Delaunay Institute, LASMIS, UMR CNRS 6279, 12 Rue Marie Curie, BP2060, 10010 Troyes Cedex (France); Le Saunier, D. [SNECMA Evry - Corbeil, Route Henry Auguste Desbrueres, 91003 Evry (France)
2012-01-15
Highlights: Black-Right-Pointing-Pointer Laser shock peening parameters studied through a design of experiments. Black-Right-Pointing-Pointer Laser fluence, pulse duration, number of impacts and sample thickness are studied. Black-Right-Pointing-Pointer The observed work hardening is low, the roughness is lightly affected. Black-Right-Pointing-Pointer A significant part of hardness increase is due to compressive residual stresses. Black-Right-Pointing-Pointer High tensile residual stresses can appear on thin laser shocked specimens. - Abstract: The influence of the process parameters of laser shock peening was investigated on specimens made of an aeronautic titanium alloy: Ti-5Al-2Sn-2Zr-4Cr-4Mo (Ti-17). In order to quantify the effect of relevant process parameters, an experimental design was carried out. It is based on a full factorial design with four factors (laser fluence, pulse duration, number of impacts and thickness of the sample) and two levels for each factor. The process is characterised with the following variables: the depth of the impacts, the roughness of the treated surface, the hardening of the material (itself evaluated with the hardness and X-ray diffraction peak width), the residual stresses left in the sample and the global curvature of the sample. It is found that all the parameters have an influence on the residual stresses and that laser shock peening has no influence on roughness and low influence on work-hardening. The variables are then analysed in order to evaluate correlations. The increase in hardness is found to be essentially due to compressive residual stresses, cold work-hardening having only a small effect. In thin specimens, the stress redistribution due to self-equilibrium leads to tensile residual stresses at the treated surface and to large deformations of the specimens.
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Effect of Process Parameter in Laser Cutting of PMMA Sheet and ANFIS Modelling for Online Control
Directory of Open Access Journals (Sweden)
Hossain Anamul
2016-01-01
Full Text Available Laser beam machining (LBM is a promising and high accuracy machining technology in advanced manufacturing process. In LBM, crucial machining qualities of the end product include heat affected zone, surface roughness, kerf width, thermal stress, taper angle etc. It is essential for industrial applications especially in laser cutting of thermoplastics to acquire output product with minimum kerf width. The kerf width is dependent on laser input parameters such as laser power, cutting speed, standoff distance, assist gas pressure etc. However it is difficult to get a functional relationship due to the high uncertainty among these parameters. Hence, total 81 sets of full factorial experiment were conducted, representing four input parameters with three different levels. The experiments were performed by a continuous wave (CW CO2 laser with the mode structure of TEM01 named Zech laser machine that can provide maximum laser power up to 500 W. The polymethylmethacrylate (PMMA sheet with thickness of 3.0 mm was used for this experiment. Laser power, cutting speed, standoff distance and assist gas pressure were used as input parameters for the output named kerf width. Standoff distance, laser power, cutting speed and assist gas pressure have the dominant effect on kerf width, respectively, although assist gas has some significant effect to remove the harmful gas. ANFIS model has been developed for online control purposes. This research is considered important and helpful for manufacturing engineers in adjusting and decision making of the process parameters in laser manufacturing industry of PMMA thermoplastics with desired minimum kerf width as well as intricate shape design purposes.
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International Nuclear Information System (INIS)
Liao Guo; He Zhibing; Xu Hua; Li Jun; Chen Taihua; Chen Jiajun
2012-01-01
Bi film was fabricated at different sputtering powers by DC magnetron sputtering. The deposition rate of Bi film as the function of sputtering power was studied. The surface topography of Bi film was observed by SEM, and the growth mode of Bi film was investigated. The crystal structure was analyzed by XRD. The grain size and stress of Bi film were calculated. The SEM images show that all the films are columnar growth. The average grain size firstly increases as the sputtering power increases, then decreases at 60 W. The film becomes loose with the increase of sputtering power, while, the film gets compact when the sputtering power becomes from 45 to 60 W. The XRD results show that films are polycrystalline of hexagonal. And the stress transforms from the tensile stress to compressive stress as the sputtering power increases. (authors)
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International Nuclear Information System (INIS)
Woryna, E.; Badziak, J.; Makowski, J.; Parys, P.; Vankov, A.B.; Wolowski, J.; Krasa, J.; Laska, L.; Rohlena, K.
2001-01-01
The parameters of Au plasma as functions of laser energy for ps pulses are presented and compared with the ones for sub-ns pulses at nearly the same densities of laser energy. The experiments were performed at the IPPLM with the use of CPA (chirped pulse amplification) Nd:glass laser system. Thick Au foil targets were irradiated by normally incident focused laser beams with maximum intensities of 8x10 16 and 2x10 14 W/cm 2 for ps and sub-ns laser pulses, respectively. The characteristics of ion streams were investigated with the use of ion diagnostics methods based on the time-of flight technique. In these experiments the laser energies were changed in the range from 90 to 700 mJ and the measurements were performed at a given focus position FP = 0 and along the target normal for both the laser pulses. The charge carried by the ions, the maximum ion velocities of fast and thermal ion groups, the maximum ion current density as well as the area of photopeak in dependence on the incident laser energy for sub-ns and ps pulses were investigated and discussed. (author)
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Hao, Ming; Liu, Kun; Liu, Xinghua; Wang, Dongyang; Ba, Dechun; Xie, Yuanhua; Du, Guangyu; Ba, Yaoshuai
2016-12-01
Transparent conductive ZAO (Zinc Aluminum Oxide) films on flexible substrates have a great potential for low-cost mass-production solar cells. ZAO thin films were achieved on flexible PET (polyethylene terephthalate) substrates by RF magnetron sputtering technology. The surface morphology and element content, the transmittance and the sheet resistance of the films were measured to determine the optical process parameters. The results show that the ZAO thin film shows the best parameters in terms of photoelectric performance including sputtering power, working pressure, sputtering time, substrate temperature (100 W, 1.5 Pa, 60 min, 125 °C). The sheet resistance of 510 Ω and transmittance in visible region of 92% were obtained after characterization. Surface morphology was uniform and compact with a good crystal grain.
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Monocrystal sputtering by the computer simulation code ACOCT
International Nuclear Information System (INIS)
Yamamura, Yasunori; Takeuchi, Wataru.
1987-09-01
A new computer code ACOCT has been developed in order to simulate the atomic collisions in the crystalline target within the binary collision approximation. The present code is more convenient as compared with the MARLOWE code, and takes the higher-order simultaneous collisions into account. To cheke the validity of the ACOCT program, we have calculated sputtering yields for various ion-target combinations and compared with the MARLOWE results. It is found that the calculated yields by the ACOCT program are in good agreements with those by the MARLOWE code. The ejection patterns of sputtered atoms were also calculated for the major surfaces of fcc, bcc, diamond and hcp structures, and we have got reasonable agreements with experimental results. In order to know the effects of the simultaneous collision in the slowing down process the sputtering yields and the projected ranges are calculated, changeing the parameter of the criterion for the simultaneous collision, and the effect of the simultaneous collision is found to depend on the crystal orientation. (author)
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Properties of tungsten films prepared by magnetron sputtering
International Nuclear Information System (INIS)
Ahn, K.Y.; Ting, C.Y.; Brodsky, S.B.; Fryer, P.M.; Davari, B.; Angillelo, J.; Herd, S.R.; Licata, T.
1986-01-01
High-rate magnetron sputtering is a relatively simple process to produce tungsten films with good electrical and mechanical properties, and it offers good uniformity, reproducibility, process flexibility, and high throughput. The purity of the sputtered films is affected by the target purity (cold-pressed 99.95%, chemical vapor deposited 99.99% and cast 99.999%), base pressure, deposition rate, and substrate bias. Typical resistivity in films of 2000 to 3000A thickness deposited on Si, poly-Si, and SiO/sub 2/ ranges from 10 to 12 μΩ-cm, and this may be compared with 6 and 11 μΩ-cm by high-temperature evaporation and chemical vapor deposition, respectively. The presence of biaxial stress caused by substrate scanning was determined by x-ray technique. The sputtered films exhibit high compressive stress when deposited at low Ar pressure. It decreases with increasing pressure, and eventually changes sign to become tensile, and increases further with increasing pressure. Effects of processing parameters on films properties, and a comparison of film properties prepared by evaporation and chemical vapor deposition are discussed
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Optimisation Of Cutting Parameters Of Composite Material Laser Cutting Process By Taguchi Method
Lokesh, S.; Niresh, J.; Neelakrishnan, S.; Rahul, S. P. Deepak
2018-03-01
The aim of this work is to develop a laser cutting process model that can predict the relationship between the process input parameters and resultant surface roughness, kerf width characteristics. The research conduct is based on the Design of Experiment (DOE) analysis. Response Surface Methodology (RSM) is used in this work. It is one of the most practical and most effective techniques to develop a process model. Even though RSM has been used for the optimization of the laser process, this research investigates laser cutting of materials like Composite wood (veneer)to be best circumstances of laser cutting using RSM process. The input parameters evaluated are focal length, power supply and cutting speed, the output responses being kerf width, surface roughness, temperature. To efficiently optimize and customize the kerf width and surface roughness characteristics, a machine laser cutting process model using Taguchi L9 orthogonal methodology was proposed.
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Parameter optimization for selective laser melting of TiAl6V4 alloy by CO2 laser
Baitimerov, R. M.; Lykov, P. A.; Radionova, L. V.; Safonov, E. V.
2017-10-01
TiAl6V4 alloy is one of the widely used materials in powder bed fusion additive manufacturing technologies. In recent years selective laser melting (SLM) of TiAl6V4 alloy by fiber laser has been well studied, but SLM by CO2-lasers has not. SLM of TiAl6V4 powder by CO2-laser was studied in this paper. Nine 10×10×10 mm cubic specimens were fabricated using different SLM process parameters. All of the fabricated specimens have a good dense structure and a good surface finish quality without dimensional distortion. The lowest porosity that was achieved was about 0.5%.
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International Nuclear Information System (INIS)
Darwiche, S.; Benmansour, M.; Eliezer, N.; Morvan, D.
2010-01-01
The quantification of boron and other impurities in photovoltaic grade silicon was investigated using the LIBS technique with attention to the laser wavelength employed, temporal parameters, and the nature of the ambient gas. The laser wavelength was found to have a moderate effect on the performance of the process, while the type of purge gas and temporal parameters had a strong effect on the signal-to-background ratio (SBR) of the boron spectral emission, which was used to determine the boron concentration in silicon. The three parameters are not independent, meaning that for each different purge gas, different optimal temporal parameters are observed. Electron density was also calculated from Stark broadening of the 390.5 nm silicon emission line in order to better understand the different performances observed when using different gases and gating parameters. Calibration curves were made for boron measurement in silicon using certified standards with different purge gases while using the temporal parameters which had been optimized for that gas. By comparing the calibration curves, it was determined that argon is superior to helium or air for use as the analysis chamber purge gas with an UV laser.
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Investigating the CO2 laser cutting parameters of MDF wood composite material
Eltawahni, Hayat; Olabi, Abdul-Ghani; Benyounis, Khaled
2011-01-01
Laser cutting of medium density fibreboard (MDF) is a complicated process and the selection of the process parameters combinations is essential to get the highest quality of the cut section. This paper presents laser cutting of MDF based on design of experiments (DOE). CO2 laser was used to cut three thicknesses 4, 6 and 9 mm of MDF panels. The process factors investigated are: laser power, cutting speed, air pressure and focal point position. In this work, cutting quality was evaluated by me...
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Kanal, Florian; Kahmann, Max; Tan, Chuong; Diekamp, Holger; Jansen, Florian; Scelle, Raphael; Budnicki, Aleksander; Sutter, Dirk
2017-02-01
The matchless properties of ultrashort laser pulses, such as the enabling of cold processing and non-linear absorption, pave the way to numerous novel applications. Ultrafast lasers arrived in the last decade at a level of reliability suitable for the industrial environment.1 Within the next years many industrial manufacturing processes in several markets will be replaced by laser-based processes due to their well-known benefits: These are non-contact wear-free processing, higher process accuracy or an increase of processing speed and often improved economic efficiency compared to conventional processes. Furthermore, new processes will arise with novel sources, addressing previously unsolved challenges. One technical requirement for these exciting new applications will be to optimize the large number of available parameters to the requirements of the application. In this work we present an ultrafast laser system distinguished by its capability to combine high flexibility and real time process-inherent adjustments of the parameters with industry-ready reliability. This industry-ready reliability is ensured by a long experience in designing and building ultrashort-pulse lasers in combination with rigorous optimization of the mechanical construction, optical components and the entire laser head for continuous performance. By introducing a new generation of mechanical design in the last few years, TRUMPF enabled its ultrashort-laser platforms to fulfill the very demanding requirements for passively coupling high-energy single-mode radiation into a hollow-core transport fiber. The laser architecture presented here is based on the all fiber MOPA (master oscillator power amplifier) CPA (chirped pulse amplification) technology. The pulses are generated in a high repetition rate mode-locked fiber oscillator also enabling flexible pulse bursts (groups of multiple pulses) with 20 ns intra-burst pulse separation. An external acousto-optic modulator (XAOM) enables linearization
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Semi-empirical formulas for sputtering yield
International Nuclear Information System (INIS)
Yamamura, Yasumichi
1994-01-01
When charged particles, electrons, light and so on are irradiated on solid surfaces, the materials are lost from the surfaces, and this phenomenon is called sputtering. In order to understand sputtering phenomenon, the bond energy of atoms on surfaces, the energy given to the vicinity of surfaces and the process of converting the given energy to the energy for releasing atoms must be known. The theories of sputtering and the semi-empirical formulas for evaluating the dependence of sputtering yield on incident energy are explained. The mechanisms of sputtering are that due to collision cascade in the case of heavy ion incidence and that due to surface atom recoil in the case of light ion incidence. The formulas for the sputtering yield of low energy heavy ion sputtering, high energy light ion sputtering and the general case between these extreme cases, and the Matsunami formula are shown. At the stage of the publication of Atomic Data and Nuclear Data Tables in 1984, the data up to 1983 were collected, and about 30 papers published thereafter were added. The experimental data for low Z materials, for example Be, B and C and light ion sputtering data were reported. The combination of ions and target atoms in the collected sputtering data is shown. The new semi-empirical formula by slightly adjusting the Matsunami formula was decided. (K.I.)
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Energy Technology Data Exchange (ETDEWEB)
Annadurai, A. [Department of Physics, PSG College of Technology, Coimbatore 641004 (India); Manivel Raja, M., E-mail: mraja@dmrl.drdo.in [Defense Metallurgical Research Laboratory, Hyderabad 500058 (India); Prabahar, K.; Kumar, Atul [Defense Metallurgical Research Laboratory, Hyderabad 500058 (India); Kannan, M.D.; Jayakumar, S. [Department of Physics, PSG College of Technology, Coimbatore 641004 (India)
2011-11-15
The residual stress instituted in Ni-Mn-Ga thin films during deposition is a key parameter influencing their shape memory applications by affecting its structural and magnetic properties. A series of Ni-Mn-Ga thin films were prepared by dc magnetron sputtering on Si(1 0 0) and glass substrates at four different sputtering powers of 25, 45, 75 and 100 W for systematic investigation of the residual stress and its effect on structure and magnetic properties. The residual stresses in thin films were characterized by a laser scanning technique. The as-deposited films were annealed at 600 deg. C for 1 h in vacuum for structural and magnetic ordering. The compressive stresses observed in as-deposited films transformed into tensile stresses upon annealing. The annealed films were found to be crystalline and possess mixed phases of both austenite and martensite, exhibiting good soft magnetic properties. It was found that the increase of sputtering power induced coarsening in thin films. Typical saturation magnetization and coercivity values were found to be 330 emu/cm{sup 3} and 215 Oe, respectively. The films deposited at 75 and 100 W display both structural and magnetic transitions above room temperature. - Highlights: > Compressive stresses observed in as-deposited films transformed into tensile stresses upon annealing. > Annealed films were found to be crystalline and possess mixed phases of both austenite and martensite, exhibiting good soft magnetic properties. > The highest Curie transition in the films was observed at 365 K. > The films deposited at 75 and 100 W display both structural and magnetic transitions above room temperature.
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Investigating the CO 2 laser cutting parameters of MDF wood composite material
Eltawahni, H. A.; Olabi, A. G.; Benyounis, K. Y.
2011-04-01
Laser cutting of medium density fibreboard (MDF) is a complicated process and the selection of the process parameters combinations is essential to get the highest quality cut section. This paper presents a means for selecting the process parameters for laser cutting of MDF based on the design of experiments (DOE) approach. A CO 2 laser was used to cut three thicknesses, 4, 6 and 9 mm, of MDF panels. The process factors investigated are: laser power, cutting speed, air pressure and focal point position. In this work, cutting quality was evaluated by measuring the upper kerf width, the lower kerf width, the ratio between the upper kerf width to the lower kerf width, the cut section roughness and the operating cost. The effect of each factor on the quality measures was determined. The optimal cutting combinations were presented in favours of high quality process output and in favours of low cutting cost.
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Energy Technology Data Exchange (ETDEWEB)
Hao, Ming [School of Mechanical Engineering and Automation, Northeastern University, 3-11 WenHua Rd., 319#, Shenyang, 110004 (China); Liu, Kun, E-mail: kliu@mail.neu.edu.cn [School of Mechanical Engineering and Automation, Northeastern University, 3-11 WenHua Rd., 319#, Shenyang, 110004 (China); Liu, Xinghua [Hubei Aerospace Industry Technology Academe Special Vehicle Technology Center, Wuhan (China); Wang, Dongyang; Ba, Dechun; Xie, Yuanhua; Du, Guangyu; Ba, Yaoshuai [School of Mechanical Engineering and Automation, Northeastern University, 3-11 WenHua Rd., 319#, Shenyang, 110004 (China)
2016-12-01
Highlights: • ZAO thin films were deposited on PET substrate. • A set of experimental parameters were systematically investigated. • Change rule of film photoelectric properties was obtained. • ZAO films with optimal properties were obtained at our working conditions. - Abstract: Transparent conductive ZAO (Zinc Aluminum Oxide) films on flexible substrates have a great potential for low-cost mass-production solar cells. ZAO thin films were achieved on flexible PET (polyethylene terephthalate) substrates by RF magnetron sputtering technology. The surface morphology and element content, the transmittance and the sheet resistance of the films were measured to determine the optical process parameters. The results show that the ZAO thin film shows the best parameters in terms of photoelectric performance including sputtering power, working pressure, sputtering time, substrate temperature (100 W, 1.5 Pa, 60 min, 125 °C). The sheet resistance of 510 Ω and transmittance in visible region of 92% were obtained after characterization. Surface morphology was uniform and compact with a good crystal grain.
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International Nuclear Information System (INIS)
Hao, Ming; Liu, Kun; Liu, Xinghua; Wang, Dongyang; Ba, Dechun; Xie, Yuanhua; Du, Guangyu; Ba, Yaoshuai
2016-01-01
Highlights: • ZAO thin films were deposited on PET substrate. • A set of experimental parameters were systematically investigated. • Change rule of film photoelectric properties was obtained. • ZAO films with optimal properties were obtained at our working conditions. - Abstract: Transparent conductive ZAO (Zinc Aluminum Oxide) films on flexible substrates have a great potential for low-cost mass-production solar cells. ZAO thin films were achieved on flexible PET (polyethylene terephthalate) substrates by RF magnetron sputtering technology. The surface morphology and element content, the transmittance and the sheet resistance of the films were measured to determine the optical process parameters. The results show that the ZAO thin film shows the best parameters in terms of photoelectric performance including sputtering power, working pressure, sputtering time, substrate temperature (100 W, 1.5 Pa, 60 min, 125 °C). The sheet resistance of 510 Ω and transmittance in visible region of 92% were obtained after characterization. Surface morphology was uniform and compact with a good crystal grain.
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Energy Technology Data Exchange (ETDEWEB)
Castro-Hurtado, I., E-mail: ichurtado@ceit.es [CEIT and Tecnun (University of Navarra), Manuel de Lardizábal 15, 20018 San Sebastián (Spain); Tavera, T.; Yurrita, P.; Pérez, N. [CEIT and Tecnun (University of Navarra), Manuel de Lardizábal 15, 20018 San Sebastián (Spain); Rodriguez, A. [CIC microGUNE Goiru kalea 9, Polo de Innovación Garaia, 20500 Arrasate-Mondragón (Spain); Mandayo, G.G.; Castaño, E. [CEIT and Tecnun (University of Navarra), Manuel de Lardizábal 15, 20018 San Sebastián (Spain)
2013-07-01
A study of the influence of annealing temperature on the structural, morphological and optical properties of WO{sub 3} thin films is presented. The coatings are deposited by RF reactive magnetron sputtering and characterized by XRD analysis and FESEM. The XRD diagrams of the samples show a phase transition from tetragonal to monoclinic when the annealing temperature is raised from 800 to 900 °C. Moreover, the increase of the annealing temperature to 800 °C favors the presence of a granular structure on the surface of the film. A decrease in the optical energy band gap (3.65–3.5 eV and 3.5–3.05 eV for direct and indirect transitions respectively) with annealing temperature has been measured employing Tauc's relation. Furthermore, WO{sub 3} thin films are processed by laser interference lithography (LIL) and periodic nanostructures are obtained. The processed films are characterized by a hexagonal symmetry with a period of 340 nm and the diameter of the nanostructured holes of 150 nm. These films show improved morphological properties of interest in several applications (gas sensors, photonic crystals, etc.) independent of the annealing temperature.
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Efimova, Varvara; Hoffmann, Volker; Eckert, Jürgen
2012-10-01
Depth profiling with pulsed glow discharge is a promising technique. The application of pulsed voltage for sputtering reduces the sputtering rate and thermal stress and hereby improves the analysis of thin layered and thermally fragile samples. However pulsed glow discharge is not well studied and this limits its practical use. The current work deals with the questions which usually arise when the pulsed mode is applied: Which duty cycle, frequency and pulse length must be chosen to get the optimal sputtering rate and crater shape? Are the well-known sputtering effects of the continuous mode valid also for the pulsed regime? Is there any difference between dc and rf pulsing in terms of sputtering? It is found that the pulse length is a crucial parameter for the crater shape and thermal effects. Sputtering with pulsed dc and rf modes is found to be similar. The observed sputtering effects at various pulsing parameters helped to interpret and optimize the depth resolution of GD OES depth profiles.
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Impact of initial surface parameters on the final quality of laser micro-polished surfaces
Chow, Michael; Bordatchev, Evgueni V.; Knopf, George K.
2012-03-01
Laser micro-polishing (LμP) is a new laser-based microfabrication technology for improving surface quality during a finishing operation and for producing parts and surfaces with near-optical surface quality. The LμP process uses low power laser energy to melt a thin layer of material on the previously machined surface. The polishing effect is achieved as the molten material in the laser-material interaction zone flows from the elevated regions to the local minimum due to surface tension. This flow of molten material then forms a thin ultra-smooth layer on the top surface. The LμP is a complex thermo-dynamic process where the melting, flow and redistribution of molten material is significantly influenced by a variety of process parameters related to the laser, the travel motions and the material. The goal of this study is to analyze the impact of initial surface parameters on the final surface quality. Ball-end micromilling was used for preparing initial surface of samples from H13 tool steel that were polished using a Q-switched Nd:YAG laser. The height and width of micromilled scallops (waviness) were identified as dominant parameter affecting the quality of the LμPed surface. By adjusting process parameters, the Ra value of a surface, having a waviness period of 33 μm and a peak-to-valley value of 5.9 μm, was reduced from 499 nm to 301 nm, improving the final surface quality by 39.7%.
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International Nuclear Information System (INIS)
Robinson, M.T.
1993-01-01
The MARLOWE program was used to study the statistics of sputtering on the example of 1- to 100-keV Au atoms normally incident on static (001) and (111) Au crystals. The yield of sputtered atoms was examined as a function of the impact point of the incident particles (''ions'') on the target surfaces. There were variations on two scales. The effects of the axial and planar channeling of the ions could be traced, the details depending on the orientation of the target and the energies of the ions. Locally, the sputtering yield was very sensitive to the impact point, small changes in position often producing large changes yield. Results indicate strongly that the sputtering yield is a random (''chaotic'') function of the impact point
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Ojima, T.; Tainosho, T.; Sharmin, S.; Yanagihara, H.
2018-04-01
Real-time in situ reflection high energy electron diffraction (RHEED) observations of Fe3O4, γ-Fe2O3, and (Co,Fe)3O4 films on MgO(001) substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) experiments. This suggests that the layer-by-layer growth of spinel ferrite (001) films is general in most physical vapor deposition (PVD) processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.
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Directory of Open Access Journals (Sweden)
T. Ojima
2018-04-01
Full Text Available Real-time in situ reflection high energy electron diffraction (RHEED observations of Fe3O4, γ-Fe2O3, and (Co,Fe3O4 films on MgO(001 substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE and pulsed laser deposition (PLD experiments. This suggests that the layer-by-layer growth of spinel ferrite (001 films is general in most physical vapor deposition (PVD processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.
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Formation and stability of sputtered clusters
International Nuclear Information System (INIS)
Andersen, H.H.
1989-01-01
Current theory for the formation of sputtered clusters states that either atoms are sputtered individually and aggregate after having left the surface or they are sputtered as complete clusters. There is no totally sharp boundary between the two interpretations, but experimental evidence is mainly thought to favour the latter model. Both theories demand a criterion for the stability of the clusters. In computer simulations of sputtering, the idea has been to use the same interaction potential as in the lattice computations to judge the stability. More qualitatively, simple geometrical shapes have also been looked for. It is found here, that evidence for 'magic numbers' and electron parity effects in clusters have existed in the sputtering literature for a long time, making more sophisticated stability criteria necessary. The breakdown of originally sputtered metastable clusters into stable clusters gives strong support to the 'sputtered as clusters' hypothesis. (author)
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The effect of laser ablation parameters on optical limiting properties of silver nanoparticles
Gursoy, Irmak; Yaglioglu, Halime Gul
2017-09-01
This paper presents the effect of laser ablation parameters on optical limiting properties of silver nanoparticles. The current applications of lasers such as range finding, guidance, detection, illumination and designation have increased the potential of damaging optical imaging systems or eyes temporary or permanently. The applications of lasers introduce risks for sensors or eyes, when laser power is higher than damage threshold of the detection system. There are some ways to protect these systems such as neutral density (nd) filters, shutters, etc. However, these limiters reduce the total amount of light that gets into the system. Also, response time of these limiters may not be fast enough to prevent damage and cause precipitation in performance due to deprivation of transmission or contrast. Therefore, optical limiting filters are needed that is transparent for low laser intensities and limit or block the high laser intensities. Metal nanoparticles are good candidates for such optical limiting filters for ns pulsed lasers or CW lasers due to their high damage thresholds. In this study we investigated the optical limiting performances of silver nanoparticles produced by laser ablation technique. A high purity silver target immersed in pure water was ablated with a Nd:YAG nanosecond laser at 532 nm. The effect of altering laser power and ablation time on laser ablation efficiency of nanoparticles was investigated experimentally and optimum values were specified. Open aperture Zscan experiment was used to investigate the effect of laser ablation parameters on the optical limiting performances of silver nanoparticles in pure water. It was found that longer ablation time decreases the optical limiting threshold. These results are useful for silver nanoparticles solutions to obtain high performance optical limiters.
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Effect of sputtering on self-damaged recrystallized W mirror specimens
Energy Technology Data Exchange (ETDEWEB)
Voitsenya, V.S. [Institute of Plasma Physics, National Scientific Center “KIPT”, 61108 Kharkov (Ukraine); Balden, M. [Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching (Germany); Belyaeva, A.I. [National Technical University, “Kharkiv Polytechnical Institute”, 61002 Kharkov (Ukraine); Alimov, V.Kh. [Hydrogen Isotope Research Center, University of Toyama, Toyama 930-8555 (Japan); Tyburska-Püschel, B., E-mail: tyburska@engr.wisc.edu [Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching (Germany); Galuza, A.A. [Institute of Electrophysics and Radiation Technologies, NAS of Ukraine, 61002 Kharkov (Ukraine); Kasilov, A.A.; Kolenov, I.V. [Institute of Plasma Physics, National Scientific Center “KIPT”, 61108 Kharkov (Ukraine); Konovalov, V.G. [National Technical University, “Kharkiv Polytechnical Institute”, 61002 Kharkov (Ukraine); Skoryk, O.O.; Solodovchenko, S.I. [Institute of Plasma Physics, National Scientific Center “KIPT”, 61108 Kharkov (Ukraine)
2013-03-15
The effect of heavy sputtering and of neutron irradiation simulated by displacement damaging with of 20 MeV W{sup 6+} ions on the optical properties of tungsten mirrors was studied. Ar{sup +} ions with 600 eV of energy were used as imitation of charge exchange atoms ejected from fusion plasma. The ion fluence dependence of the surface topography and the optical properties of polycrystalline, recrystallized tungsten (grain size 20–100 μm) were studied by optical microscopy, interferometry, reflectometry and ellipsometry. Furthermore, after sputtering in total a layer of 3.9 μm in thickness, the orientation and the thickness of the eroded layer of many individual grains was determined by electron backscattering diffraction and confocal laser scanning microscopy. Concluding from the obtained data the neutron irradiation, at least at the damage level would be achieved in ITER, has not to make an additional contribution in the processes developing under impact of charge exchange atoms only.
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Transport theory of sputtering I: Depth of origin of sputtered atoms
International Nuclear Information System (INIS)
Zhang, Z.L.
1999-01-01
Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error <10%) for m=3D0.2. It is also shown that, if the sputtering yield equals the corresponding one in Sigmund's theory, the depth of origin of sputtered atoms must be shorter than in Sigmund's theory for 0.25 m ≥ 3D 0. The former even may be only about one half of the latter as long as m=3D0. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)
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Simultaneous Intrinsic and Extrinsic Parameter Identification of a Hand-Mounted Laser-Vision Sensor
Directory of Open Access Journals (Sweden)
Taikyeong Jeong
2011-09-01
Full Text Available In this paper, we propose a simultaneous intrinsic and extrinsic parameter identification of a hand-mounted laser-vision sensor (HMLVS. A laser-vision sensor (LVS, consisting of a camera and a laser stripe projector, is used as a sensor component of the robotic measurement system, and it measures the range data with respect to the robot base frame using the robot forward kinematics and the optical triangulation principle. For the optimal estimation of the model parameters, we applied two optimization techniques: a nonlinear least square optimizer and a particle swarm optimizer. Best-fit parameters, including both the intrinsic and extrinsic parameters of the HMLVS, are simultaneously obtained based on the least-squares criterion. From the simulation and experimental results, it is shown that the parameter identification problem considered was characterized by a highly multimodal landscape; thus, the global optimization technique such as a particle swarm optimization can be a promising tool to identify the model parameters for a HMLVS, while the nonlinear least square optimizer often failed to find an optimal solution even when the initial candidate solutions were selected close to the true optimum. The proposed optimization method does not require good initial guesses of the system parameters to converge at a very stable solution and it could be applied to a kinematically dissimilar robot system without loss of generality.
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International Nuclear Information System (INIS)
Schmitz, Tobias; Warmuth, Franziska; Werner, Ewald; Hertl, Cornelia; Groll, Jürgen; Gbureck, Uwe; Moseke, Claus
2014-01-01
Silver-doped Ti films were produced using a single magnetron sputtering source equipped with a titanium target containing implemented silver modules under variation of bias voltage and substrate temperature. The Ti(Ag) films were characterized regarding their morphology, contact angle, phase composition, silver content and distribution as well as the elution of Ag + ions into cell media. SEM and AFM pictures showed that substrate heating during film deposition supported the formation of even and dense surface layers with small roughness values, an effect that could even be enforced, when a substrate bias voltage was applied instead. The deposition of both Ti and Ag was confirmed by X-ray diffraction. ICP-MS and EDX showed a clear correlation between the applied sputtering parameters and the silver content of the coatings. Surface-sensitive XPS measurements revealed that higher substrate temperatures led to an accumulation of Ag in the near-surface region, while the application of a bias voltage had the opposite effect. Additional elution measurements using ICP-MS showed that the release kinetics depended on the amount of silver located at the film surface and hence could be tailored by variation of the sputter parameters. - Highlights: • Modular targets were used to deposit Ti(Ag) films. • Ag-content is adjustable by bias voltage, sputtering power and substrate temperature. • Coating parameters significantly change film morphology and roughness. • A critical parameter for Ag release is the fraction of silver on the film surface
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International Nuclear Information System (INIS)
Galvez de la Puente, G.; Guerra Torres, J.A.; Erlenbach, O.; Steidl, M.; Weingaertner, R.; De Zela, F.; Winnacker, A.
2010-01-01
We produce amorphous silicon carbide thin films (a-SiC) by radio frequency (rf) magnetron sputtering from SiC bulk target. We present the emission pattern of the rf magnetron with SiC target as a function of process parameters, like target sample distance, rf power, sputtering rate and process gas pressure. The emission pattern is determined by means of thickness distribution of the deposited a-SiC films obtained from optical transmission measurements using a slightly improved method of Swanepoel concerning the determination of construction of the envelopes in the interference pattern of the transmission spectra. A calibration curve is presented which allows the conversion of integrated transmission to film thickness. Holding constant a set of process parameters and only varying the target sample distance the emission pattern of the rf magnetron with SiC target was determined, which allowed us to predict the deposition rate distribution for a wide range of process parameters and target geometry. In addition, we have found that the transmission spectra of the a-SiC films change with time and saturate after approximately 10 days. Within this process no change in thickness is involved, so that the determination of thickness using transmission data is justified.
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Laser ablation characteristics of metallic materials: Role of Debye-Waller thermal parameter
International Nuclear Information System (INIS)
Butt, M Z
2014-01-01
The interaction of a high intensity laser pulse with a solid target results in the formation of a crater and a plasma plume. The characteristics of both depend on physical properties of target material, environmental conditions, and laser parameters (e.g. wavelength, pulse duration, energy, beam diameter) etc. It has been shown for numerous metals and their alloys that plasma threshold fluence, plasma threshold energy, ablation efficiency, ablation yield, angular distribution of laser produced plasma (LPP) ions, etc. are a unique function of the Debye-Waller thermal parameter B or the mean-square amplitude of atomic vibration of the target material for given experimental conditions. The FWHM of the angular distribution of LPP ions, ablation yield, and ablation efficiency increase whereas plasma threshold fluence and plasma threshold energy decrease as B-factor of the target material increases
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Structural and optical properties of electro-optic material. Sputtered (Ba,Sr)TiO3
International Nuclear Information System (INIS)
Suzuki, Masato; Xu, Zhimou; Tanushi, Yuichiro; Yokoyama, Shin
2006-01-01
In order to develop a novel ring resonator optical switch, we have studied the structural and optical properties of the electro-optic material (Ba,Sr)TiO 3 (BST) deposited by RF sputtering on a SiO 2 cladding layer (1.0 μm). The crystallinity of the BST films is evaluated by X-ray diffraction and the optical propagation loss of the waveguides is measured using a He-Ne laser. As a result, it is found that there is a strong relationship between the optical propagation loss and crystallinity of the sputtered film. It is suggested that the propagating light is influenced by the crystal property, for example, the grain size and density of the polycrystalline BST film. (author)
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International Nuclear Information System (INIS)
Kelly, R.
1977-01-01
An energetic ion which is incident on a solid target causes a momentary temperature increase in the impact region, i.e., a so-called thermal spike occurs. Such spikes are capable of causing (or supplementing) disordering, precipitation, crystallization, electronic excitation, stoichiometry change, desorption, and sputtering, it being the contribution to sputtering that is considered here. The approach used is compatible with modern damage-distribution theory. Thus the temperature profile left by the incident ion is taken as a three-dimensional Gaussian with parameters appropriate to power-law scattering, and is used as the initial condition for solving the heat-conduction equation. Let us write this solution as T = T(t, y), where t is time and y is a dimension parallel to the target surface. The vaporization flux from a solid surface is taken as pnsup(1/2)(2π 2 >kT)sup(-1/2), where p, the equilibrium pressure of a vapor species containing n atoms, can be written as p 0 exp(-L/T), p 0 and L are constants largely independent of temperature, and 2 > is the mean mass per atom of target. An equation for the thermal sputtering coefficient is given: after integration the final result takes the form: Ssub(thermal)=pnsup(1/2)[2π 2 >k(Tsub(infinity)+cΔT 0 )]sup(-1/2)πlambda 2 tsub(eff.)atoms/ion, where Tsub(infinity) is the macroscopic target temperature, cΔT 0 is the maximum temperature increase at x = y = 0, p is to be evaluated at T = Tsub(infinity) + cΔT 0 , lambda is the mean atomic spacing of the target, and tsub(eff.) is a quantity with units of time. (author)
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High-power sputtering employed for film deposition
International Nuclear Information System (INIS)
Shapovalov, V I
2017-01-01
The features of high-power magnetron sputtering employed for the films’ deposition are reviewed. The main physical phenomena accompanying high-power sputtering including ion-electron emission, gas rarefaction, ionization of sputtered atoms, self-sputtering, ion sound waves and the impact of the target heating are described. (paper)
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Systematic investigations of low energy Ar ion beam sputtering of Si and Ag
Energy Technology Data Exchange (ETDEWEB)
Feder, R., E-mail: rene.feder@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig (Germany); Frost, F.; Neumann, H.; Bundesmann, C.; Rauschenbach, B. [Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig (Germany)
2013-12-15
Ion beam sputter deposition (IBD) delivers some intrinsic features influencing the growing film properties, because ion properties and geometrical process conditions generate different energy and spatial distributions of the sputtered and scattered particles. Even though IBD has been used for decades, the full capabilities are not investigated systematically and specifically used yet. Therefore, a systematic and comprehensive analysis of the correlation between the properties of the ion beam, the generated secondary particles and backscattered ions and the deposited films needs to be done. A vacuum deposition chamber has been set up which allows ion beam sputtering of different targets under variation of geometrical parameters (ion incidence angle, position of substrates and analytics in respect to the target) and of ion beam parameters (ion species, ion energy) to perform a systematic and comprehensive analysis of the correlation between the properties of the ion beam, the properties of the sputtered and scattered particles, and the properties of the deposited films. A set of samples was prepared and characterized with respect to selected film properties, such as thickness and surface topography. The experiments indicate a systematic influence of the deposition parameters on the film properties as hypothesized before. Because of this influence, the energy distribution of secondary particles was measured using an energy-selective mass spectrometer. Among others, experiments revealed a high-energetic maximum for backscattered primary ions, which shifts with increasing emission angle to higher energies. Experimental data are compared with Monte Carlo simulations done with the well-known Transport and Range of Ions in Matter, Sputtering version (TRIM.SP) code [J.P. Biersack, W. Eckstein, Appl. Phys. A: Mater. Sci. Process. 34 (1984) 73]. The thicknesses of the films are in good agreement with those calculated from simulated particle fluxes. For the positions of the
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Dependence of sputtering erosion on fuel-pellet characteristics
International Nuclear Information System (INIS)
Bohachevsky, I.O.; Hafer, J.F.
1977-11-01
Conceptual designs of fusion reactors operating on the principle of inertial confinement require that the dependence of cavity-wall erosion on fuel-pellet energy yield, its mass, and representative atomic number be known. A simple approximate model of sputtering erosion is presented and explicit formulas are derived that express the total amount of eroded wall material in terms of the above three parameters
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Emission parameters and thermal management of single high-power 980-nm laser diodes
International Nuclear Information System (INIS)
Bezotosnyi, V V; Krokhin, O N; Oleshchenko, V A; Pevtsov, V F; Popov, Yu M; Cheshev, E A
2014-01-01
We report emission parameters of high-power cw 980-nm laser diodes (LDs) with a stripe contact width of 100 μm. On copper heat sinks of the C-mount type, a reliable output power of 10 W is obtained at a pump current of 10 A. Using a heat flow model derived from analysis of calculated and measured overall efficiencies at pump currents up to 20 A, we examine the possibility of raising the reliable power limit of a modified high-power LD mounted on heat sinks of the F-mount type using submounts with optimised geometric parameters and high thermal conductivity. The possibility of increasing the maximum reliable cw output power to 20 W with the use of similar laser crystals is discussed. (lasers)
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International Nuclear Information System (INIS)
Pantojas, V.M.; Otano-Rivera, W.; Caraballo, Jose N.
2005-01-01
A response surface statistical method was used to study the effects of deposition pressure, power and substrate temperature on the degree of preferred orientation of aluminum nitride films grown on Si (111) by dc magnetron sputtering. The AlN films were deposited at gas pressures ranging from 0.66 to 1.33 Pa, substrate temperature from 300 to 400 deg. C and power from 100 to 200 W. The degree of preferred orientation was evaluated and quantified using two-dimensional X-ray diffraction, which provides information on the out of plane (002) crystal alignment. The statistical method yielded a surface response curve in the parameter space and a correlation equation between the deposition parameters was obtained. Substrate temperature showed no significant effect upon texture quality for the temperature range studied. A surface response graph as a function of pressure and power was obtained. The main factor affecting texture quality was found to be a pressure-power interaction. The possible mechanisms that contribute to such correlation are discussed. Our best films yielded a rocking curve with full width at half maximum of 6.3 deg
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International Nuclear Information System (INIS)
Rigato, V.; Maggioni, G.; Boscarino, D.; Della Mea, G.; Univ. di Trento, Mesiano
1996-01-01
Lead-silicate glassy thin films produced by means of Reactive Radio Frequency Magnetron Sputtering have found recent application in the development of MicroStrip Gas Chambers radiation detectors. Here, thin films (100--400 nm) of lead silicate glass have been deposited by RF magnetron sputtering in Ar plasma at different discharge conditions. The interaction of the sputtered species with the gas atoms during the transport process through the discharge region and the kinetics of growth of the films have been investigated as a function of the target composition and of the substrate temperature. This study demonstrates the possibility of controlling the surface electrical resistance of the films in a wide range of values ranging from 10 12 to 10 17 Ω/□ during the film growth
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Institute of Scientific and Technical Information of China (English)
Hailin Sun; Susan Field; Jian Chen; Dennis. G. Teer
2004-01-01
Closed Field Unbalanced Magnetron Sputter Ion Plating (CFUBMSIP) systems have been used increasingly for PVD coating in recent years. TiN and CrN coatings, commonly used as the basic coating for a number of different hard coatings, have been chosen to study the coating process parameters for the CFUBMSIP system. In this paper, the process parameters, such as substrate temperature, substrate bias and OEM control, have been carefully examined to achieve hard and wear-resistance coatings with good adhesion. The coating structure and orientation were found to change according to the coating parameters. The Rockwell test and Scratch test were carried out to examine the coating adhesion; pin-on-disc testing was used to estimate the wear-resistant; micro-hardness was also used to determine coating hardness. HSS drill testing has been carried out to study the general properties of the coating for cutting tool application. A combination of process parameters can be selected to achieve good performance for the TiN and CrN coatings.
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The effect of fiber laser parameters on microhardness and microstructure of duplex stainless steel
Directory of Open Access Journals (Sweden)
Mohammed Ghusoon R.
2017-01-01
Full Text Available An investigation was implement to study the influence of laser power, and speed of the welding on hardness, microstructure, and penetration of laser welding bead on plate duplex stainless steel, which is not exhibited so far. A fiber laser was selected for welding duplex stainless steel sheet with 2 mm thickness. Then, optical microscope (OM was used in the morphologic observation of cross section, penetration depth, and bead width. Microhardness of the welded sheet was measured using Vickers hardness. Profiles of hardness and microstructure were utilized to discriminate welding line and to propose superior welding parameters. The experimental results displayed that, a good quality of duplex steel welds can be acquired when a suitable fiber laser welding parameters were selected. It was found that microhardness profiles showed a rise in the hardness of the weld and heat-affected zones as the solidification process proceeds rapidly. Additionally, the crystal solidification process induced by the fiber laser welding was schematically clarified and systematically exposed.
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Influence of laser parameters on laser ultrasonic efficiency
CSIR Research Space (South Africa)
Forbes, A
2007-01-01
Full Text Available , TEA CO2 lasers, laser chemistry, short pulses 1. INTRODUCTION Polymer-matrix composites are increasingly used in the aerospace industry, particularly in the manufacture of modern fighter planes1-3. The number and complexity of such composites... efficiency can be improved by utilising short pulses in the 3–4 µm and 10 µm spectral regions1. Short pulse 10 µm radiation can be produced by transversely excited, atmospheric CO2 (TEA CO2) lasers. Due to the technological maturity of these lasers...
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High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering
Energy Technology Data Exchange (ETDEWEB)
Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)
2011-01-15
We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
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Lutz, Yves; Poyet, Jean-Michel; Metzger, Nicolas
2013-10-01
Laser diode stacks are interesting laser sources for active imaging illuminators. They allow the accumulation of large amounts of energy in multi-pulse mode, which is well suited for long-range image recording. Even when laser diode stacks are equipped with fast-axis collimation (FAC) and slow-axis collimation (SAC) microlenses, their beam parameter product (BPP) are not compatible with a direct use in highly efficient and compact illuminators. This is particularly true when narrow divergences are required such as for long range applications. To overcome these difficulties, we conducted investigations in three different ways. A first near infrared illuminator based on the use of conductively cooled mini-bars was designed, realized and successfully tested during outdoor experimentations. This custom specified stack was then replaced in a second step by an off-the-shelf FAC + SAC micro lensed stack where the brightness was increased by polarization overlapping. The third method still based on a commercial laser diode stack uses a non imaging optical shaping principle resulting in a virtually restacked laser source with enhanced beam parameters. This low cost, efficient and low alignment sensitivity beam shaping method allows obtaining a compact and high performance laser diode illuminator for long range active imaging applications. The three methods are presented and compared in this paper.
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Optimization of Cutting Parameters of the Haynes 718 Nickel Alloy With Gas CO2 Laser
Directory of Open Access Journals (Sweden)
Jana PETRŮ
2011-06-01
Full Text Available This article deals with the application of laser technology and the optimization of parameters in the area of nickel alloy laser cutting intended for application in the aircraft industry. The main goal is to outline possibilities of use of the laser technology, primarily its application in the area of 3D material cutting. This experiment is focused on the optimization of cutting parameters of the Haynes 718 alloy with a gas CO2 laser. Originating cuts are evaluated primarily from the point of view of cut quality and accompanying undesirable phenomena occurring in the process of cutting. In conclusion the results achieved in the metallographic laboratory are described and analyzed.
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Directory of Open Access Journals (Sweden)
Bogdanov R.V.
2015-03-01
Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.
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DEFF Research Database (Denmark)
Baragiola, R.A.; Vidal, R.A.; Svendsen, W.
2003-01-01
We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...
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Simulation experiments and solar wind sputtering
International Nuclear Information System (INIS)
Griffith, J.E.; Papanastassiou, D.A.; Russell, W.A.; Tombrello, T.A.; Weller, R.A.
1978-01-01
In order to isolate the role played by solar wind sputtering from other lunar surface phenomena a number of simulation experiments were performed, including isotope abundance measurements of Ca sputtered from terrestrial fluorite and plagioclase by 50-keV and 130-keV 14 N beams, measurement of the energy distribution of U atoms sputtered with 80-keV 40 Ar, and measurement of the fraction of sputtered U atoms which stick on the surfaces used to collect these atoms. 10 references
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Estimating the best laser parameters for skin cancer treatment using finite element models
International Nuclear Information System (INIS)
El-Berry, A.A.; El-Berry, A.A.; Solouma, N.H.; Hassan, F.; Ahmed, A.S.
2010-01-01
Skin cancer is an intimidating disease which necessitates the presence of a non-invasive treatment. Laser-induced thermo therapy is one of the recent noninvasive modalities of superficial lesion treatment. Although of its promising effect, this method still needs more effort to be quantized. Many studies are being conducted for this purpose. Modeling and simulating the process of skin lesion treatment by laser can lead to the best quantization of the treatment protocol. In this paper, we provide finite element models for the treatment of skin cancer using laser thermal effect. A comparison between the effects of using different laser parameters of diode laser (800nm) and Nd: Yag laser (1064 nm) revealed that Nd: Yag laser can be used effectively foe skin cancer treatment specially with high intensities of about 106 w/m 2 .
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Directory of Open Access Journals (Sweden)
Waheed Khan
2018-03-01
Full Text Available We report the first results of functional properties of nitrogenized silver-permalloy thin films deposited on polyethylene terephthalic ester {PETE (C10H8O4n} flexible substrates by magnetron sputtering. These new soft magnetic thin films have magnetization that is comparable to pure Ni81Fe19 permalloy films. Two target compositions (Ni76Fe19Ag5 and Ni72Fe18Ag10 were used to study the effect of compositional variation and sputtering parameters, including nitrogen flow rate on the phase evolution and surface properties. Aggregate flow rate and total pressure of Ar+N2 mixture was 60 sccm and 0.55 Pa, respectively. The distance between target and the substrate was kept at 100 mm, while using sputtering power from 100–130 W. Average film deposition rate was confirmed at around 2.05 nm/min for argon atmosphere and was reduced to 1.8 nm/min in reactive nitrogen atmosphere. X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, vibrating sample magnetometer, and contact angle measurements were used to characterize the functional properties. Nano sized character of films was confirmed by XRD and SEM. It is found that the grain size was reduced by the formation of nitride phase, which in turns enhanced the magnetization and lowers the coercivity. Magnetic field coupling efficiency limit was determined from 1.6–2 GHz frequency limit. The results of comparable magnetic performance, lowest magnetic loss, and highest surface free energy, confirming that 15 sccm nitrogen flow rate at 115 W is optimal for producing Ag-doped permalloy flexible thin films having excellent magnetic field coupling efficiency.
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Effects of hair removal alexandrite laser on biometric parameters of the skin.
Alavi, Shiva; Abolhasani, Ehsan; Nilforoushzadeh, Mohammadali
2016-04-01
The effects of alexandrite laser (AL) on skin parameters such as melanin content, skin layer depth, elasticity, and density have not been investigated through biometric methods. We aim to assess the effect of AL on the skin parameters through biometric devices to determine whether it has positive effects on treated region. In this pretest-posttest study, we recruited patients who attended Laser Clinic of Skin and Stem Cell Research Center, Tehran University of Medical Sciences, Tehran, Iran, from January through December 2014. Patients had to be free of any dermatologic conditions and lesion at the site of treatment or any contraindication to laser therapy. Baseline measurements were performed and patients received four sessions of AL therapy (spot size, 12 mm; fluence, 12 J/cm(2); and pulse width, 5 Hz) with 4-week intervals. Four weeks after the last treatment session, the same parameters were assessed that included skin color, transepidermal water loss (TEWL), dermis and epidermis density and depth (through skin ultrasonography), melanin content, erythema intensity, and skin elasticity. Biometric parameters of 33 patients (27 females [81.8%]), with mean (SD) age of 35.7 (9.5) years were evaluated. The mean percent changes of skin parameters were as follows: skin color, 5.88% through Visioface and by 56.8% through Colorimeter devices (became lighter); melanin content, -15.95%; TEWL, -2.96%; elasticity, +14.88%; dermis depth -19.01%; and dermis density, +1580.11% (P < 0.001 for changes in each parameter). AL could decrease melanin content of the skin and make the skin thinner while it could increase elasticity and density of epidermis and dermis, which might indicate increased collagen content of skin.
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Directory of Open Access Journals (Sweden)
Miloš Madić
2015-01-01
Full Text Available In this paper, an attempt has been made to develop a mathematical model in order to study the relationship between laser cutting parameters such as laser power, cutting speed, assist gas pressure and focus position, and kerf taper angle obtained in CO2 laser cutting of AISI 304 stainless steel. To this aim, a single hidden layer artificial neural network (ANN trained with gradient descent with momentum algorithm was used. To obtain an experimental database for the ANN training, laser cutting experiment was planned as per Taguchi’s L27 orthogonal array with three levels for each of the cutting parameters. Statistically assessed as adequate, ANN model was then used to investigate the effect of the laser cutting parameters on the kerf taper angle by generating 2D and 3D plots. It was observed that the kerf taper angle was highly sensitive to the selected laser cutting parameters, as well as their interactions. In addition to modeling, by applying the Monte Carlo method on the developed kerf taper angle ANN model, the near optimal laser cutting parameter settings, which minimize kerf taper angle, were determined.
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Implantation, recoil implantation, and sputtering
International Nuclear Information System (INIS)
Kelly, R.
1984-01-01
The implantation and sputtering mechanisms which are relevant to ion bombardment of surfaces are described. These are: collision, thermal, electronic and photon-induced sputtering. 135 refs.; 36 figs.; 9 tabs
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Diode laser heat treatment of lithium manganese oxide films
International Nuclear Information System (INIS)
Pröll, J.; Kohler, R.; Mangang, A.; Ulrich, S.; Bruns, M.; Seifert, H.J.; Pfleging, W.
2012-01-01
The crystallization of lithium manganese oxide thin films prepared by radio frequency magnetron sputtering on stainless steel substrates under 10 Pa argon pressure is demonstrated by a laser annealing technique. Laser annealing processes were developed as a function of annealing time and temperature with the objective to form an electrochemically active lithium manganese oxide cathode. It is demonstrated, that laser annealing with 940 nm diode laser radiation and an annealing time of 2000 s at 600 °C delivers appropriate parameters for formation of a crystalline spinel-like phase. Characteristic features of this phase could be detected via Raman spectroscopy, showing the characteristic main Raman band at 627 cm -1 . Within cyclic voltammetric measurements, the two characteristic redox pairs for spinel lithium manganese oxide in the 4 V region could be detected, indicating that the film was well-crystallized and de-/intercalation processes were reversible. Raman post-analysis of a cycled cathode showed that the spinel-like structure was preserved within the cycling process but mechanical degradation effects such as film cracking were observed via scanning electron microscopy. Typical features for the formation of an additional surface reaction layer could be detected using X-ray photoelectron spectroscopy.
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Laser Welding Process Parameters Optimization Using Variable-Fidelity Metamodel and NSGA-II
Directory of Open Access Journals (Sweden)
Wang Chaochao
2017-01-01
Full Text Available An optimization methodology based on variable-fidelity (VF metamodels and nondominated sorting genetic algorithm II (NSGA-II for laser bead-on-plate welding of stainless steel 316L is presented. The relationships between input process parameters (laser power, welding speed and laser focal position and output responses (weld width and weld depth are constructed by VF metamodels. In VF metamodels, the information from two levels fidelity models are integrated, in which the low-fidelity model (LF is finite element simulation model that is used to capture the general trend of the metamodels, and high-fidelity (HF model which from physical experiments is used to ensure the accuracy of metamodels. The accuracy of the VF metamodel is verified by actual experiments. To slove the optimization problem, NSGA-II is used to search for multi-objective Pareto optimal solutions. The results of verification experiments show that the obtained optimal parameters are effective and reliable.
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2015-11-01
necessary anneal . Following this, a thin film of NiTi was blanket sputtered at 600 °C. This NiTi blanket layer was then wet -etch patterned using a...varying the sputter parameters during NiTi deposition, such as thickness, substrate temperature during deposition and anneal , and argon pressure during...6 Fig. 4 Surface texture comparison between NiTi sputtered at RT, then annealed at 600 °C, and NiTi
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Low-Damage Sputter Deposition on Graphene
Chen, Ching-Tzu; Casu, Emanuele; Gajek, Marcin; Raoux, Simone
2013-03-01
Despite its versatility and prevalence in the microelectronics industry, sputter deposition has seen very limited applications for graphene-based electronics. We have systematically investigated the sputtering induced graphene defects and identified the reflected high-energy neutrals of the sputtering gas as the primary cause of damage. In this talk, we introduce a novel sputtering technique that is shown to dramatically reduce bombardment of the fast neutrals and improve the structural integrity of the underlying graphene layer. We also demonstrate that sputter deposition and in-situ oxidation of 1 nm Al film at elevated temperatures yields homogeneous, fully covered oxide films with r.m.s. roughness much less than 1 monolayer, which shows the potential of using such technique for gate oxides, tunnel barriers, and multilayer fabrication in a wide range of graphene devices.
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A Mossbauer study of Kr incorporations in sputtered a-Si films
Rosu, M.F; Niesen, L; van Veen, A.; Sloof, W.G.
1996-01-01
Krypton atoms incorporated in sputtered a-silicon films are investigated by means of Kr-83 Mosssbauer spectroscopy. The hyperfine parameters of the (RbI)-Rb-83 source were determined by taking a spectrum against solid krypton. Mossbauer spectra were taken for films containing krypton concentrations
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Discharge Characteristic of VHF-DC Superimposed Magnetron Sputtering System
Toyoda, Hirotaka; Fukuoka, Yushi; Fukui, Takashi; Takada, Noriharu; Sasai, Kensuke
2014-10-01
Magnetron plasmas are one of the most important tools for sputter deposition of thin films. However, energetic particles from the sputtered target such as backscattered rare gas atoms or oxygen negative ions from oxide targets sometimes induce physical and chemical damages as well as surface roughening to the deposited film surface during the sputtering processes. To suppress kinetic energy of such particles, superposition of RF or VHF power to the DC power has been investigated. In this study, influence of the VHF power superposition on the DC target voltage, which is important factor to determine kinetic energy of high energy particles, is investigated. In the study, 40 MHz VHF power was superimposed to an ITO target and decrease in the target DC voltage was measured as well as deposited film deposition properties such as deposition rate or electrical conductivity. From systematic measurement of the target voltage, it was revealed that the target voltage can be determined by a very simple parameter, i.e., a ratio of VHF power to the total input power (DC and VHF powers) in spite of the DC discharge current. Part of this work was supported by ASTEP, JST.
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Application of high rate magnetron sputtering to the fabrication of A-15 compounds
International Nuclear Information System (INIS)
Kampwirth, R.T.; Hafstrom, J.W.; Wu, C.T.
1976-01-01
High quality Nb 3 Sn films have been fabricated using a recently developed magnetron sputtering process capable of deposition rates approaching 1 μm/min. at sputtering voltages less than 500 V and power levels of about 5 KW. Low sputtering voltages allow more complete thermalization at lower pressures of the material condensing on the substrate which can improve long range order. Transition temperatures of up to 18.3 0 K, J/sub c/(O)'s of 15 x 10 6 A/cm 2 and Hc 2 as high as 240 kOe have been achieved in 1-3 μm films deposited from a Nb 3 Sn reacted powder target with substrate temperatures between 600 and 800 0 C. The films exhibit smooth surfaces and, generally, a [200] preferred orientation. The growth of the film is columnar in nature. The sputtering parameters, substrate material and temperature will be related to film structure T/sub c/ and J/sub c/(H,T) and the Nb/Sn ratio as determined by Rutherford backscattering
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Dependence of mis-alignment sensitivity of ring laser gyro cavity on cavity parameters
Energy Technology Data Exchange (ETDEWEB)
Sun Feng; Zhang Xi; Zhang Hongbo; Yang Changcheng, E-mail: sunok1234@sohu.com [Huazhong Institute of Electro-Optics - Wuhan National Lab for Optoelectronics, Wuhan, Hubei (China)
2011-02-01
The ring laser gyroscope (RLG), as a rotation sensor, has been widely used for navigation and guidance on vehicles and missiles. The environment of strong random-vibration and large acceleration may deteriorate the performance of the RLG due to the vibration-induced tilting of the mirrors. In this paper the RLG performance is theoretically analyzed and the parameters such as the beam diameter at the aperture, cavity mirror alignment sensitivities and power loss due to the mirror tilting are calculated. It is concluded that by carefully choosing the parameters, the significant loss in laser power can be avoided.
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Kinetic energy distributions of sputtered neutral aluminum clusters: Al--Al6
International Nuclear Information System (INIS)
Coon, S.R.; Calaway, W.F.; Pellin, M.J.; Curlee, G.A.; White, J.M.
1992-01-01
Neutral aluminum clusters sputtered from polycrystalline aluminum were analyzed by laser postionization time-of-flight (TOF) mass spectrometry. The kinetic energy distributions of Al through Al 6 were measured by a neutrals time-of-flight technique. The interpretation of laser postionization TOF data to extract velocity and energy distributions is presented. The aluminum cluster distributions are qualitatively similar to previous copper cluster distribution measurements from our laboratory. In contrast to the steep high energy tails predicted by the single- or multiple- collision models, the measured cluster distributions have high energy power law dependences in the range of E -3 to E -4.5 . Correlated collision models may explain the substantial abundance of energetic clusters that are observed in these experiments. Possible influences of cluster fragmentation on the distributions are discussed
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Origins of Beta Tantalum in Sputtered Coatings
National Research Council Canada - National Science Library
Mulligan, C
2001-01-01
.... Some of the most recent work has attempted to relate the energetics (i.e., atom/ion energy) of the plasma to the alpha right arrow beta transition. It has been shown that the energetics of the plasma can relate to the most crucial sputtering parameters. The most significant feature of the use of plasma energy to explain the alpha right arrow beta transition is that it relates the formation of beta-tantalum to a quantifiable measure.
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Directory of Open Access Journals (Sweden)
Rakasita R
2016-06-01
Full Text Available Optimasi parameter adalah teknik yang digunakan pada proses manufaktur untuk menghasilkan produk terbaik. Penelitian ini bertujuan untuk mengoptimasi parameter CNC laser cutting, yaitu titik fokus sinar laser, tekanan gas cutting dan cutting speed untuk mengurangi variasi terhadap respon kekasaran dan laju pemotongan pada material SUS 316L. Masing-masing parameter memiliki 3 level dan pada penelitian ini menggunakan matriks orthogonal L9 (34. Metode ANOVA dan Taguchi digunakan untuk menganalisis data hasil percobaan. Optimasi kekasaran minimum permukaan dan laju pemotongan maksimum pada proses laser cutting dilakukan dengan menggunakan Grey relational analysis. Eksperimen konfirmasi digunakan untuk membuktikan hasil optimal yang telah didapatkan dari metode Taguchi Grey relational analysis. Hasil eksperimen menunjukkan bahwa Taguchi Grey relational analysis efektif digunakan untuk mengoptimasi parameter pemesinan pada laser cutting dengan multi respon. Abstract Parameter optimization is used in manufacturing as an indicator to produce the best manufacturing product. This paper studies an optimization parameters of CNC laser cutting such as focus of laser beam, pressure cutting gases and cutting speed for reducing variation of surface roughness and cutting rate on material SUS 316L. Based on L9(34 orthogonal array parameters, it is analized using ANOVA based on Taguchi method. In order to optimaze the minimum surface roughness and maximum cutting rate in laser cutting process, it is used Grey relational analysis. The confirmation experiments used to validate the optimal results that has done by Taguchi method. The results show that the Taguchi Grey relational analysis is being effective to optimize the machining parameters for laser cutting process with two responses.
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Effect of pulsed laser parameters on in-situ TiC synthesis in laser surface treatment
Hamedi, M. J.; Torkamany, M. J.; Sabbaghzadeh, J.
2011-04-01
Commercial titanium sheets pre-coated with 300-μm thick graphite layer were treated by employing a pulsed Nd:YAG laser in order to enhance surface properties such as wear and erosion resistance. Laser in-situ alloying method produced a composite layer by melting the titanium substrate and dissolution of graphite in the melt pool. Correlations between pulsed laser parameters, microstructure and microhardness of the synthesized composite coatings were investigated. Effects of pulse duration and overlapping factor on the microstructure and hardness of the alloyed layer were deduced from Vickers micro-indentation tests, XRD, SEM and metallographic analyses of cross sections of the generated layer. Results show that the composite cladding layer was constituted with TiC intermetallic phase between the titanium matrix in particle and dendrite forms. The dendritic morphology of composite layer was changed to cellular grain structure by increasing laser pulse duration and irradiated energy. High values of the measured hardness indicate that deposited titanium carbide increases in the conditions with more pulse duration and low process speed. This occurs due to more dissolution of carbon into liquid Ti by heat input increasing and positive influence of the Marangoni flow in the melted zone.
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Argonne inverted sputter source
International Nuclear Information System (INIS)
Yntema, J.L.; Billquist, P.J.
1983-01-01
The emittance of the inverted sputter source with immersion lenses was measured to be about 5π mm mrad MeV/sup 1/2/ at the 75% level over a wide range of beam intensities. The use of the source in experiments with radioactive sputter targets and hydrogen loaded targets is described. Self contamination of the source is discussed
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Sputtering and reflection of self-bombardment of tungsten material
International Nuclear Information System (INIS)
Niu, Guo-jian; Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi; Luo, Guang-nan
2015-01-01
In present research, the sputtering and reflection yield of self-bombardment of tungsten are investigated with the aid of molecular dynamics simulations. The source of sputtered and reflected atoms is detected by traced the original locations of sputtered and reflected atoms. Results show that for the reflected atoms no specific region exists which means cluster atoms are randomly reflected. But almost all of sputtered atoms are from a conical region under the landing point of cluster. So we can determine the sputtering yield by study the dimension of the sputtering region. Molecular dynamics shows the depth and radius of the conical are power functions of impacting energy. The effects of cluster size and temperature of target on sputtering and reflection rate are also preformed in present study. Both sputtering and reflection yield are proportion to cluster size in present cluster size, i.e. 66–2647 atoms. Higher target temperature can increase sputtering yield and deduce sputtering threshold energy, but little effect on reflection rate
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Sputtering and reflection of self-bombardment of tungsten material
Energy Technology Data Exchange (ETDEWEB)
Niu, Guo-jian [University of Science and Technology of China, Hefei (China); Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi [Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Luo, Guang-nan, E-mail: gnluo@ipp.ac.cn [University of Science and Technology of China, Hefei (China); Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Hefei Center for Physical Science and Technology, Hefei (China); Hefei Science Center of CAS, Hefei (China)
2015-04-15
In present research, the sputtering and reflection yield of self-bombardment of tungsten are investigated with the aid of molecular dynamics simulations. The source of sputtered and reflected atoms is detected by traced the original locations of sputtered and reflected atoms. Results show that for the reflected atoms no specific region exists which means cluster atoms are randomly reflected. But almost all of sputtered atoms are from a conical region under the landing point of cluster. So we can determine the sputtering yield by study the dimension of the sputtering region. Molecular dynamics shows the depth and radius of the conical are power functions of impacting energy. The effects of cluster size and temperature of target on sputtering and reflection rate are also preformed in present study. Both sputtering and reflection yield are proportion to cluster size in present cluster size, i.e. 66–2647 atoms. Higher target temperature can increase sputtering yield and deduce sputtering threshold energy, but little effect on reflection rate.
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Data compilation of angular distributions of sputtered atoms
International Nuclear Information System (INIS)
Yamamura, Yasunori; Takiguchi, Takashi; Tawara, Hiro.
1990-01-01
Sputtering on a surface is generally caused by the collision cascade developed near the surface. The process is in principle the same as that causing radiation damage in the bulk of solids. Sputtering has long been regarded as an undesirable dirty effect which destroys the cathodes and grids in gas discharge tubes or ion sources and contaminates plasma and the surrounding walls. However, sputtering is used today for many applications such as sputter ion sources, mass spectrometers and the deposition of thin films. Plasma contamination and the surface erosion of first walls due to sputtering are still the major problems in fusion research. The angular distribution of the particles sputtered from solid surfaces can possibly provide the detailed information on the collision cascade in the interior of targets. This report presents a compilation of the angular distribution of sputtered atoms at normal incidence and oblique incidence in the various combinations of incident ions and target atoms. The angular distribution of sputtered atoms from monatomic solids at normal incidence and oblique incidence, and the compilation of the data on the angular distribution of sputtered atoms are reported. (K.I.)
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Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma
Energy Technology Data Exchange (ETDEWEB)
Liang, Peipei; Yang, Xu; Li, Hui; Cai, Hua [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Sun, Jian; Xu, Ning [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Wu, Jiada, E-mail: jdwu@fudan.edu.cn [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433 (China)
2015-10-15
A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanying film growth. And, the re-sputtering presents ion-induced sputtering features.
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Dwell time dependent morphological transition and sputtering yield of ion sputtered Sn
International Nuclear Information System (INIS)
Qian, H X; Zeng, X R; Zhou, W
2010-01-01
Self-organized nano-scale patterns may appear on a wide variety of materials irradiated with an ion beam. Good manipulation of these structures is important for application in nanostructure fabrication. In this paper, dwell time has been demonstrated to be able to control the ripple formation and sputtering yield on Sn surface. Ripples with a wavelength of 1.7 μm were observed for a dwell time in the range 3-20 μs, whereas much finer ripples with a wavelength of 540 nm and a different orientation were observed for a shorter dwell time in the range 0.1-2 μs. The sputtering yield increases with dwell time significantly. The results provide a new basis for further steps in the theoretical description of morphology evolution during ion beam sputtering.
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Parameters Influence of CO2 Laser on Cutting Quality of Polymer Materials
Robert Cep; Sarka Malotova; Marek Pagac; Marek Sadilek; Jiri Lichovnik
2016-01-01
The article deals with evaluating of the resulting surface state of the three plastic materials and identification of suitable conditions for laser cutting with CO2 tube. As representative were chosen polypropylene, polymethylmethacrylate and polyamide. When cutting these types of materials it could melt eventually their re-sintering. A suitable combination of parameters is possible to achieve of sufficient quality of the cut. The samples were cut at different feed speed and laser power. Then...
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Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering
Directory of Open Access Journals (Sweden)
Damon Rafieian
2015-09-01
Full Text Available We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx<2, obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, whereas stoichiometric films formed anatase. This route therefore presents a formation route for rutile films via lower (<500 °C temperature pathways. The dynamics of the annealing process were followed by in situ ellipsometry, showing the optical properties transformation. The final crystal structures were identified by XRD. The anatase film obtained by this deposition method displayed high carriers mobility as measured by time-resolved microwave conductance. This also confirms the high photocatalytic activity of the anatase films.
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International Nuclear Information System (INIS)
Payziyev, Sh.D.; Bakhramov, S.A.; Shayimov, F.F.; Fayziev, A.Sh.
2015-01-01
The analysis of an effect of Cr 4+ impurity ions, existent in Nd 3+ :Cr 3+ :GSGG and Nd 3+ :Cr 3+ :YAG laser materials on output parameters of solar pumped lasers is carried out by modeling of lasing process at solar pumping. (authors)
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Chemical sputtering of graphite by H+ ions
International Nuclear Information System (INIS)
Busharov, N.P.; Gorbatov, E.A.; Gusev, V.M.; Guseva, M.I.; Martynenko, Y.V.
1976-01-01
In a study of the sputtering coefficient S for the sputtering of graphite by 10-keV H + ions as a function of the graphite temperature during the bombardment, it is found that at T> or =750degreeC the coefficient S is independent of the target temperature and has an anomalously high value, S=0.085 atom/ion. The high rate of sputtering of graphite by atomic hydrogen ions is shown to be due to chemical sputtering of the graphite, resulting primarily in the formation of CH 4 molecules. At T=1100degreeC, S falls off by a factor of about 3. A model for the chemical sputtering of graphite is proposed
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Laser and Plasma Technology Division annual report 1992
International Nuclear Information System (INIS)
Venkatramani, N.; Verma, R.L.
1993-01-01
The report describes the research and development (R and D) activities of Laser and Plasma technology Division, Bhabha Atomic Research Centre, Bombay during 1992. The broad programme objectives of the Division are: (1) development and technology readiness studies of laser, plasma and electron beam devices, (2) studies on related physical phenomena with a view to gain better understanding of the devices, and (3) improvements in technology and exploration of new areas. The R and D activities are reported under the sections entitled: (1) Laser Activities, (2) Thermal Plasma Activities, and (3) Electron Beam Activities. At the end of each section, a list of publications by the staff members in the field indicated by the title of the section is given. Some of the highlights of R and D work during 1992 are:(1) fabrication of an electron beam sustained CO 2 laser, (2) commissioning of a 6.5 m high LMMHD (Liquid Metal Magneto-hydrodynamic) generator loaded with 1.5 tons of mercury, (3) fabrication of electron beam processing equipment, and (4) study of the magnetic properties of vanadium nitride films produced by reactive sputtering in an indigenously developed DC magnetron sputtering equipment. (author). 56 figs., 6 tabs
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Nagy, M.; Behúlová, M.
2017-11-01
Nowadays, the laser technology is used in a wide spectrum of applications, especially in engineering, electronics, medicine, automotive, aeronautic or military industries. In the field of mechanical engineering, the laser technology reaches the biggest increase in the automotive industry, mainly due to the introduction of automation utilizing 5-axial movements. Modelling and numerical simulation of laser welding processes has been exploited with many advantages for the investigation of physical principles and complex phenomena connected with this joining technology. The paper is focused on the application of numerical simulation to the design of welding parameters for the circumferential laser welding of thin-walled exhaust pipes from theAISI 304 steel for automotive industry. Using the developed and experimentally verified simulation model for laser welding of tubes, the influence of welding parameters including the laser velocity from 30 mm.s-1 to 60 mm.s-1 and the laser power from 500 W to 1200 W on the temperature fields and dimensions of fusion zone was investigated using the program code ANSYS. Based on obtained results, the welding schedule for the laser beam welding of thin-walled tubes from the AISI 304 steel was suggested.
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International Nuclear Information System (INIS)
Brenning, N; Huo, C; Raadu, M A; Lundin, D; Helmersson, U; Vitelaru, C; Stancu, G D; Minea, T
2012-01-01
The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared with direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target due to a substantial negative potential profile, sometimes called an extended presheath, from the location of ionization toward the cathode. Recent studies in HiPIMS devices, using floating-emitting and swept-Langmuir probes, show that such extended potential profiles do exist, and that the electric fields E z directed toward the target can be strong enough to seriously reduce ion transport to the substrate. However, they also show that the potential drops involved can vary by up to an order of magnitude from case to case. There is a clear need to understand the underlying mechanisms and identify the key discharge variables that can be used for minimizing the back-attraction. We here present a combined theoretical and experimental analysis of the problem of electric fields E z in the ionization region part of HiPIMS discharges, and their effect on the transport of ionized sputtered material. In particular, we have investigated the possibility of a ‘sweet spot’ in parameter space in which the back-attraction of ionized sputtered material is low. It is concluded that a sweet spot might possibly exist for some carefully optimized discharges, but probably in a rather narrow window of parameters. As a measure of how far a discharge is from such a window, a Townsend product Π Townsend is proposed. A parametric analysis of Π Townsend shows that the search for a sweet spot is complicated by the fact that contradictory demands appear for several of the externally controllable parameters such as high/low working gas pressure, short/long pulse length, high/low pulse power and high/low magnetic field strength. (paper)
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Fluence-dependent sputtering yield of micro-architectured materials
Energy Technology Data Exchange (ETDEWEB)
Matthes, Christopher S.R.; Ghoniem, Nasr M., E-mail: ghoniem@ucla.edu; Li, Gary Z.; Matlock, Taylor S.; Goebel, Dan M.; Dodson, Chris A.; Wirz, Richard E.
2017-06-15
Highlights: • Sputtering yield is shown to be transient and heavily dependent on surface architecture. • Fabricated nano- and Microstructures cause geometric re-trapping of sputtered material, which leads to a self-healing mechanism. • Initially, the sputtering yield of micro-architectured Mo is approximately 1/2 the value as that of a planar surface. • The study demonstrates that the sputtering yield is a dynamic property, dependent on the surface structure of a material. • A developed phenomenological model mathematically describes the transient behavior of the sputtering yield as a function of plasma fluence. - Abstract: We present an experimental examination of the relationship between the surface morphology of Mo and its instantaneous sputtering rate as function of low-energy plasma ion fluence. We quantify the dynamic evolution of nano/micro features of surfaces with built-in architecture, and the corresponding variation in the sputtering yield. Ballistic deposition of sputtered atoms as a result of geometric re-trapping is observed, and re-growth of surface layers is confirmed. This provides a self-healing mechanism of micro-architectured surfaces during plasma exposure. A variety of material characterization techniques are used to show that the sputtering yield is not a fundamental property, but that it is quantitatively related to the initial surface architecture and to its subsequent evolution. The sputtering yield of textured molybdenum samples exposed to 300 eV Ar plasma is roughly 1/2 of the corresponding value for flat samples, and increases with ion fluence. Mo samples exhibited a sputtering yield initially as low as 0.22 ± 5%, converging to 0.4 ± 5% at high fluence. The sputtering yield exhibits a transient behavior as function of the integrated ion fluence, reaching a steady-state value that is independent of initial surface conditions. A phenomenological model is proposed to explain the observed transient sputtering phenomenon, and to
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Computer simulation of sputtering: A review
International Nuclear Information System (INIS)
Robinson, M.T.; Hou, M.
1992-08-01
In 1986, H. H. Andersen reviewed attempts to understand sputtering by computer simulation and identified several areas where further research was needed: potential energy functions for molecular dynamics (MD) modelling; the role of inelastic effects on sputtering, especially near the target surface; the modelling of surface binding in models based on the binary collision approximation (BCA); aspects of cluster emission in MD models; and angular distributions of sputtered particles. To these may be added kinetic energy distributions of sputtered particles and the relationships between MD and BCA models, as well as the development of intermediate models. Many of these topics are discussed. Recent advances in BCA modelling include the explicit evaluation of the time in strict BCA codes and the development of intermediate codes able to simulate certain many-particle problems realistically. Developments in MD modelling include the wide-spread use of many-body potentials in sputtering calculations, inclusion of realistic electron excitation and electron-phonon interactions, and several studies of cluster ion impacts on solid surfaces
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Heavy particle transport in sputtering systems
Trieschmann, Jan
2015-09-01
This contribution aims to discuss the theoretical background of heavy particle transport in plasma sputtering systems such as direct current magnetron sputtering (dcMS), high power impulse magnetron sputtering (HiPIMS), or multi frequency capacitively coupled plasmas (MFCCP). Due to inherently low process pressures below one Pa only kinetic simulation models are suitable. In this work a model appropriate for the description of the transport of film forming particles sputtered of a target material has been devised within the frame of the OpenFOAM software (specifically dsmcFoam). The three dimensional model comprises of ejection of sputtered particles into the reactor chamber, their collisional transport through the volume, as well as deposition of the latter onto the surrounding surfaces (i.e. substrates, walls). An angular dependent Thompson energy distribution fitted to results from Monte-Carlo simulations is assumed initially. Binary collisions are treated via the M1 collision model, a modified variable hard sphere (VHS) model. The dynamics of sputtered and background gas species can be resolved self-consistently following the direct simulation Monte-Carlo (DSMC) approach or, whenever possible, simplified based on the test particle method (TPM) with the assumption of a constant, non-stationary background at a given temperature. At the example of an MFCCP research reactor the transport of sputtered aluminum is specifically discussed. For the peculiar configuration and under typical process conditions with argon as process gas the transport of aluminum sputtered of a circular target is shown to be governed by a one dimensional interaction of the imposed and backscattered particle fluxes. The results are analyzed and discussed on the basis of the obtained velocity distribution functions (VDF). This work is supported by the German Research Foundation (DFG) in the frame of the Collaborative Research Centre TRR 87.
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Sputtering on cobalt with noble gas ions
International Nuclear Information System (INIS)
Sarholt-Kristensen, L.; Johansen, A.; Johnson, E.
1983-01-01
Single crystals of cobalt have been bombarded with 80 keV Ar + ions and with 80 keV and 200 keV Xe + ions in the [0001] direction of the hcp phase and the [111] direction of the fcc phase. The sputtering yield has been measured as function of target temperature (20 0 C-500 0 C), showing a reduction in sputtering yield for 80 keV Ar + ions and 200 keV Xe + ions, when the crystal structure changes from hcp to fcc. In contrast to this, bombardment with 80 keV Xe + ions results in an increase in sputtering yield as the phase transition is passed. Sputtering yields for [111] nickel are in agreement with the sputtering yields for fcc cobalt indicating normal behaviour of the fcc cobalt phase. The higher sputtering yield of [0001] cobalt for certain combinations of ion mass and energy may then be ascribed to disorder induced partly by martensitic phase transformation, partly by radiation damage. (orig.)
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SiO2-Ta2O5 sputtering yields: simulated and experimental results
International Nuclear Information System (INIS)
Vireton, E.; Ganau, P.; Mackowski, J.M.; Michel, C.; Pinard, L.; Remillieux, A.
1994-09-01
To improve mirrors coating, we have modeled sputtering of binary oxide targets using TRIM code. First, we have proposed a method to calculate TRIM input parameters using on the one hand thermodynamic cycle and on the other hand Malherbe's results. Secondly, an iterative processing has provided for oxide steady targets caused by ionic bombardment. Thirdly, we have exposed a model to get experimental sputtering yields. Fourthly, for (Ar - SiO 2 ) pair, we have determined that steady target is a silica one. A good agreement between simulated and experimental yields versus ion incident angle has been found. For (Ar - Ta 2 O 5 ) pair, we have to introduce preferential sputtering concept to explain discrepancy between simulation and experiment. In this case, steady target is tantalum monoxide. For (Ar - Ta(+O 2 ) pair, tantalum sputtered by argon ions in reactive oxygen atmosphere, we have to take into account new concept of oxidation stimulated by ion beam. We have supposed that tantalum target becomes a Ta 2 O 5 one in reactive oxygen atmosphere. Then, following mechanism is similar to previous pair. We have obtained steady target of tantalum monoxide too. Comparison between simulated and experimental sputtering yields versus ion incident angle has given very good agreement. By simulation, we have found that tantalum monoxide target has at least 15 angstrom thickness. Those results are compatible with Malherbe's and Taglauer's ones. (authors)
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Electrical resistivity of sputtered molybdenum films
International Nuclear Information System (INIS)
Nagano, J.
1980-01-01
The electrical resistivity of r.f. sputtered molybdenum films of thickness 5-150 nm deposited on oxidized silicon substrates was resolved into the three electron scattering components: isotropic background scattering, scattering at grain boundaries and scattering at surfaces. It was concluded that the isotropic background scattering is almost equal to that of bulk molybdenum and is not influenced by sputtering and annealing conditions. When the film thickness is sufficient that surface scattering can be ignored, the decrease in film resistivity after annealing is caused by the decrease in scattering at the grain boundaries for zero bias sputtered films, and is caused by an increase of the grain diameter for r.f. bias sputtered films. (Auth.)
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Energy Technology Data Exchange (ETDEWEB)
Feder, Rene; Frost, Frank; Mayr, Stefan G.; Neumann, Horst; Bundesmann, Carsten [Leibniz-Institut fuer Oberflaechenmodifizierung e.V., Leipzig (Germany)
2012-07-01
Ion beam sputter processes deliver some intrinsic features influencing the growing film properties. Utilisation of these features needs to know how primary ion properties and geometrical process conditions influence the energy and spatial distribution of the sputtered and scattered particles. Beside complex experiments simulations are helpful to explain the correlation between primary parameters and thin film properties. The paper presents first results of two simulation codes with completely different approaches: Monte Carlo (MC) calculations with help of the well known TRIM.SP code and Molecular Dynamics calculations with an in-house developed code. First results of both simulation principles are compared for Argon ion bombardment on a Silicon target. Furthermore, a special experimental setup is outlined for validation of modelling. The setup allows the variation of ion beam parameters (ion species, ion energy, ion incidence angle on the target) and the measurement of the properties of sputtered and scattered particles.
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Ultra-intense laser-matter interactions at extreme parameters
International Nuclear Information System (INIS)
Hegellich, Bjorn M.
2010-01-01
The field of shortpulse lasers has seen rapid growth in the recent years with the three major boundaries of energy, pulse duration and repetition rate being pushed in ever extremer regions. At peak powers, already exceeding 10 22 W/cm 2 , in virtually every experiment in relativistic laser physics, the laser pulse interacts with a more or less extended and heated plasma, due to prepulses and ASE-like pedestals on ps - ns time scales. By developing a new technique for ultrahigh contrast, we were able to initiate the next paradigm shift in relativistic laser-matter interactions, allowing us to interact ultrarelativistic pulses volumetrically with overdense targets. This becomes possible by using target and laser parameters that will turn the target relativistically transparent during the few 10s-100s femtoseconds fo the interaction. Specifically, we interact an ultraintese, ultrahigh contrast pulse with solid density, free standing, nanometer diamond target. This paradigm change towards a volumetric overdense interaction in turn enables new particle acceleration mechanisms for both electrons and ions, as well as forward directed relativistic surface harmonics. We report here on first experiments done on those topics at the 200 TW Trident laser at Los Alamos as well as at the Ti:Sapphire system at MBI. We will compare the experimental data to massive large scale 3D simulations done on the prototype of LANL's new Petafiop supercomputer Roadrunner, which is leading the current top 500 list. Specifically, we developed a shortpulse OPA based pulse cleaning technique. Fielding it at the Trident 200 TW laser at Los Alamos, we were able to improve the pulse contrast by 6 orders of magnitude to better than 2 x 10 -12 at less than a ps. This enabled for the first time the interaction of a 100J, 200TW laser pulse with a truly solid target with virtually no expansion before the main pulse - target interaction, making possible the use of very thin targets, The thinnest of these
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Determination of electron beam parameters by means of laser-Compton scattering
Directory of Open Access Journals (Sweden)
K. Chouffani
2006-05-01
Full Text Available Laser-Compton scattering (LCS experiments were carried out at the Idaho Accelerator Center using the 5 ns (FWHM and 22 MeV electron beam. The electron beam was brought to an approximate head-on collision with a 29 MW, 7 ns (FWHM, 10 Hz Nd:YAG laser. Clear and narrow x-ray peaks resulting from the interaction of relativistic electrons with the Nd:YAG laser second harmonic line at 532 nm were observed. We have developed a relatively new method of using LCS as a nonintercepting electron beam monitor. Our method focused on the variation of the shape of the LCS spectrum rather than the LCS intensity as a function of the observation angle in order to extract the electron beam parameters at the interaction region. The electron beam parameters were determined by making simultaneous fits to spectra taken across the LCS x-ray cone. This scan method allowed us also to determine the variation of LCS x-ray peak energies and spectral widths as a function of the detector angles. Experimental data show that in addition to being viewed as a potential bright, tunable, and quasimonochromatic x-ray source, LCS can provide important information on the electron beam pulse length, direction, energy, angular and energy spread. Since the quality of LCS x-ray peaks, such as degree of monochromaticity, peak energy and flux, depends strongly on the electron beam parameters, LCS can therefore be viewed as an important nondestructive tool for electron beam diagnostics.
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Bhuiyan, Md. Mosharraf Hossain; Ueda, Tsuyoshi; Ikegami, Tomoaki; Ebihara, Kenji
2006-10-01
Tungsten trioxide (WO3) thin films gas sensors were prepared by the KrF excimer pulsed laser deposition (PLD) method. The films were prepared on the quartz glass, silicon and also on the Al2O3 sensor substrates with platinum interdigitated electrodes. The effect of doping of the platinum (Pt), palladium (Pd) or gold (Au) on the WO3 thin film was also investigated. These metals were doped to the WO3 thin film by the DC sputtering process during the PLD. The substrate temperature and the oxygen pressure were 400 °C and 100 mTorr, respectively, during the deposition. The films were characterized by atomic force microscopy (AFM) and X-ray diffraction (XRD). The sensitivity of the prepared sensors to 60 ppm NO gas was examined using the two terminal resistance method in a chamber at atmospheric pressure and operating temperatures of 25-350 °C. The sensitivity of the WO3 thin films doped with Pt, Pd, or Au was found to be higher than that of the undoped WO3 thin film.
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International Nuclear Information System (INIS)
Rim, Y.S.; Kim, H.J.; Kim, K.H.
2010-01-01
The amorphous indium zinc oxide (IZO) thin films were deposited on polyethersulfone (PES) and glass substrates using the facing targets sputtering (FTS) system. The electrical, optical and structural properties of the IZO thin films deposited as functions of sputtering parameters on the glass and PES substrates. An optimal IZO deposition condition is fabricated for organic light-emitting device (OLED) based on glass and PES. The amorphous IZO anode-based OLEDs show superior current density and luminance characteristics.
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Measurements of laser parameters for the Shiva laser fusion facility
International Nuclear Information System (INIS)
Ozarski, R.G.
1979-01-01
Large laser systems require numerous laser diagnostics to provide configuration, performance and maintenance data to permit efficient operation. The following diagnostics for a large laser system named Shiva are discussed: (1) description of Shiva laser system, (2) what measurements are desired and or required and why, (3) what measurement techniques and packages are employed and a brief description of the operating principles of the sensors employed, and (4) the laser diagnostic data acquisition and display system
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Physical sputtering of metallic systems by charged-particle impact
International Nuclear Information System (INIS)
Lam, N.Q.
1989-12-01
The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs
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Effects of variable sticking coefficients on the stability of reactive sputtering process
International Nuclear Information System (INIS)
Li Chuan; Hsieh Janghsing
2004-01-01
In reactive sputtering, the introduction of a reactive gas can lead to a hysteresis transition from metal to compounds in both the target and substrate. The hysteresis transition is characterized by a sudden change in partial pressure, sputtering rate, fraction of compound formation, etc. Therefore, stability is an important issue in the process control. In this paper, a mathematical model with variable sticking coefficients based on surface kinetics is used to study the stability of the process. The variable sticking coefficient represents different mechanisms for surface reactions from the Langmuir to precursor type. In order to facilitate the analysis, several nondimensional parameters are identified and used for formulation. Results show that an unsteady system converges to a steady state relatively fast at low inflow rates. With an eigenvalue analysis, the range of positive eigenvalues is consistent with the presence of a hysteresis loop. It is also found that when the chemical reaction on the substrate is moderate, a higher sputter yield of the compound leads to a more stable steady state at lower inflow rates. Regarding the sticking mechanism, for the type of precursors with the parameter k < 1, the compound is easier to form and saturate on the surface due to the higher default sticking coefficient and the lower operating conditions for the hysteresis transition
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Parameters Influence of CO2 Laser on Cutting Quality of Polymer Materials
Directory of Open Access Journals (Sweden)
Robert Cep
2016-09-01
Full Text Available The article deals with evaluating of the resulting surface state of the three plastic materials and identification of suitable conditions for laser cutting with CO2 tube. As representative were chosen polypropylene, polymethylmethacrylate and polyamide. When cutting these types of materials it could melt eventually their re-sintering. A suitable combination of parameters is possible to achieve of sufficient quality of the cut. The samples were cut at different feed speed and laser power. Then they was compared on the basis of the measured roughness parameters Ra a Rz by using a portable touch roughness Hommel-Etamic W5 and dates was processed according to ČSN EN ISO 4287. Cutting of samples was realized at the Department of Machining, Assembly and Engineering Metrology, VŠB-TUO.
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Effect Of Laser CO2 Parameters In Marking Of Glass
International Nuclear Information System (INIS)
Khanafi-Benghalem, Nafissa; Boudoukha, Hassina; Benghalem, Kamel
2008-01-01
Currently many techniques of marking are exploited in a great number of sectors, on various materials (cardboard, textile, wood, leather, plastic, metal, ceramics and glass). The printing is done on supports of great or small dimension for all geometrical forms (plane, round, conical and ovalised). We can print colour as much than we wish. The marking technology for the identification of the glass parts knows a remarkable development carried by the new needs for the industrialists using transparent materials such as the optical, chemical, pharmaceutical sectors, the luxury and drink industries or publicity and decoration (neon signs, advertising mirrors). The objective of our work consists particularly in engraving on glass the measurement scales forming a whole of ordered graduation which the goal is to carry out reading systems of measuring apparatus about 1/10 μm of precision. We used as tool for marking the laser CO 2 . Our choice is justified by the flexibility of the laser, the permanent lifespan of the graduations carried out and the guarantee of the facility of reading incidentally the precision and the accuracy of the measuring apparatus. The study parameters of the laser beam are the velocity (400, 600, 800, 1000 m/s.), the power (25, 75 and 80% of 25W) and the numbers pass (one, two and three pass). The optical observations results obtained suggest that the highest and the average power used remain the favourable parameters for the quality of the graduations carried out.
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Li, Ming
2011-12-03
We report a simple and cost-effective method for fabricating integrated electronic-microfluidic devices with multilayer configurations. A CO 2 laser plotter was employed to directly write patterns on a transferred polydimethylsiloxane (PDMS) layer, which served as both a bonding and a working layer. The integration of electronics in microfluidic devices was achieved by an alignment bonding of top and bottom electrode-patterned substrates fabricated with conventional lithography, sputtering and lift-off techniques. Processes of the developed fabrication method were illustrated. Major issues associated with this method as PDMS surface treatment and characterization, thickness-control of the transferred PDMS layer, and laser parameters optimization were discussed, along with the examination and testing of bonding with two representative materials (glass and silicon). The capability of this method was further demonstrated by fabricating a microfluidic chip with sputter-coated electrodes on the top and bottom substrates. The device functioning as a microparticle focusing and trapping chip was experimentally verified. It is confirmed that the proposed method has many advantages, including simple and fast fabrication process, low cost, easy integration of electronics, strong bonding strength, chemical and biological compatibility, etc. © Springer-Verlag 2011.
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Energy Technology Data Exchange (ETDEWEB)
Weng, Ko-Wei; Hu, Chung-Hsuan; Hua, Li-Yu; Lee, Chin-Tan [Department of Electronic Engineering, National Quemoy University, 1 Daxue Road, Jinning Township, Kinmen 89250, Taiwan, ROC (China); Zhao, Yu-Xiang [Department of Computer Science and Information Engineering, National Quemoy University, Taiwan, ROC (China); Chang, Julian; Yang, Shu-Yi [Department of Applied English, National Quemoy University, Taiwan, ROC (China); Han, Sheng, E-mail: shenghan@nutc.edu.tw [Center for General Education, National Taichung University of Science and Technology, 129 San-min Road, Section 3, Taichung 40401, Taiwan, ROC (China)
2016-08-15
Highlights: • TiO{sub 2}/TiWO{sub x} films were fabricated by a bipolar pulsed magnetron sputtering apparatus. • Titanium oxide being sputtered tungsten enhanced the highly oriented of TiO{sub 2} (1 0 1) plane of the specimen assemblies. • The mechanism WO{sub 3}(h{sup +}, e{sup −})/TiO{sub 2}(h{sup +}, e{sup −}) → WO{sub 3}(e{sup −})/TiO{sub 2}(h{sup +}) shows the higher hydrophilicity and lower contact angle. - Abstract: Titanium oxide films were formed by sputtering and then TiWO{sub x} films were deposited by bipolar pulsed magnetron sputtering with pure titanium and tungsten metal targets. The sputtering of titanium oxide with tungsten enhanced the orientation of the TiO{sub 2} (1 0 1) plane of the specimen assemblies. The main varying parameter was the tungsten pulse power. Titanium oxide sputtered with tungsten using a pulsing power of 50 W exhibited a superior hydrophilic property, and a contact angle of 13.1°. This fabrication conditions maximized the photocatalytic decomposition of methylene blue solution. The mechanism by which the titanium oxide was sputtered with tungsten involves the photogeneration of holes and electron traps, inhibiting the hole–electron recombination, enhancing hydrophilicity and reducing the contact angle.
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Investigations of the polarization behavior of quantum cascade lasers by Stokes parameters.
Janassek, Patrick; Hartmann, Sébastien; Molitor, Andreas; Michel, Florian; Elsäßer, Wolfgang
2016-01-15
We experimentally investigate the full polarization behavior of mid-infrared emitting quantum cascade lasers (QCLs) in terms of measuring the complete Stokes parameters, instead of only projecting them on a linear polarization basis. We demonstrate that besides the pre-dominant linear TM polarization of the emitted light as governed by the selection rules of the intersubband transition, small non-TM contributions, e.g., circularly polarized light, are present reflecting the birefringent behavior of the semiconductor quantum well waveguide. Surprisingly unique is the persistence of these polarization properties well below laser threshold. These investigations give further insight into understanding, manipulating, and exploiting the polarization properties of QCLs, both from a laser point of view and with respect toward applications.
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Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering
International Nuclear Information System (INIS)
Besland, M P; Barroy, P R J; Richard-Plouet, M; Tessier, P Y; Brohan, L; Djouadi, M A; Borderon, C; Tacon, S Le; Averty, D; Gundel, H W
2008-01-01
Well crystallized BLT thin films were deposited by RF magnetron sputtering using a target of Aurivillius phase Bi 3.25 La 0.75 Ti 3 O 12 (BLT 0,75 ), elaborated in our institute. RF sputtering experiments were performed at room temperature with an argon/oxygen mixture, in a pressure range of 20-50 mTorr. Optimisation of the plasma parameters, namely deposition pressure, RF power and oxygen content in the gas phase, allows obtaining BLT films with a chemical composition close to Bi 3.25 La 0.75 Ti 3 O 12 . After ex-situ annealing under oxygen atmosphere at 650 deg. C, BLT films deposited on Pt/TiO 2 /SiO 2 /Si (multilayer) substrates exhibit well defined rod-like grains morphology. A two step deposition process appeared to be necessary in order to reach satisfying dielectric properties. The effect of the plasma parameters on the chemical composition and electrical properties are presented and discussed
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Marchesan, Melissa Andréia; Brugnera-Junior, Aldo; Souza-Gabriel, Aline Evangelista; Correa-Silva, Silvio Rocha; Sousa-Neto, Manoel D
2008-06-01
The purpose of this in vitro study was to investigate using the scanning electron microscope (SEM) the ultrastructural morphological changes of the radicular dentine surface after irradiation with 980-nm diode laser energy at different parameters and angles of incidence. There have been limited reports on the effects of diode laser irradiation at 980 nm on radicular dentin morphology. Seventy-two maxillary canines were sectioned and roots were biomechanically prepared using K3 rotary instruments. The teeth were irrigated with 2 mL of distilled water between files and final irrigation was performed with 10 mL of distilled water. The teeth were then randomly divided into five groups (n = 8 each) according to their diode laser parameters: Group 1: no irradiation (control); group 2: 1.5 W/continuous wave (CW) emission (the manufacturer's parameters); group 3: 1.5 W/100 Hz; group 4: 3 W/CW; and group 5: 3 W/100 Hz. Laser energy was applied with helicoid movements (parallel to the canal walls) for 20 sec. Eight additional teeth for each group were endodontically prepared and split longitudinally and irradiation was applied perpendicularly to the root surface. Statistical analysis showed no difference between the root canal thirds irradiated with the 980-nm diode laser, and similar results between the parameters 1.5 W/CW and 3 W/100 Hz (p > 0.05). When considering different output powers and delivery modes our results showed that changes varied from smear layer removal to dentine fusion.
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Influence of Selected Parameters of XeCl Excimer Laser System on Characteristics of Radiation Pulses
International Nuclear Information System (INIS)
Pokora, L.; Iwanejko, L.
1998-01-01
We present the dependences of energy and duration of radiation pulses as well as efficiency of XeCl laser on selected parameters of the laser system such as: C 2 capacitance, the separating inductance, L S , the distance between electrodes in laser's chamber, d K and also the supply voltage, U 0 , composition, and pressure of the active-medium mixture of gases. Results of numerical computations relate to a three-component mixture of gases, He-Xe-HCl, of the active medium of the excimer laser. (author)
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Sputtering properties of tungsten 'fuzzy' surfaces
International Nuclear Information System (INIS)
Nishijima, D.; Baldwin, M.J.; Doerner, R.P.; Yu, J.H.
2011-01-01
Sputtering yields of He-induced W 'fuzzy' surfaces bombarded by Ar have been measured in the linear divertor plasma simulator PISCES-B. It is found that the sputtering yield of a fuzzy surface, Y fuzzy , decreases with increasing fuzzy layer thickness, L, and saturates at ∼10% of that of a smooth surface, Y smooth , at L > 1 μm. The reduction in the sputtering yield is suspected to be due mainly to the porous structure of fuzz, since the ratio, Y fuzzy /Y smooth follows (1 - p fuzz ), where p fuzz is the fuzz porosity. Further, Y fuzzy /Y smooth is observed to increase with incident ion energy, E i . This may be explained by an energy dependent change in the angular distribution of sputtered W atoms, since at lower E i , the angular distribution is observed to become more butterfly-shaped. That is, a larger fraction of sputtered W atoms can line-of-sight deposit/stick onto neighboring fuzz nanostructures for lower E i butterfly distributions, resulting in lower ratio of Y fuzzy /Y smooth .
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Construction of a sputtering reactor for the coating and processing of monolithic U-Mo nuclear fuel
International Nuclear Information System (INIS)
Schmid, Wolfgang
2011-01-01
In the presented thesis sputter deposition was used for the first time to coat monolithic U-Mo nuclear fuel foils with diffusion inhibitive materials. The intention of these coatings is to prevent the formation of an interdiffusion layer between U-Mo and Al cladding during the use of the fuel. A small sputtering reactor was built, in which the method was tested and processing parameters were investigated. In parallel a larger sputtering reactor was constructed, that allows to coat full size monolithic U-Mo nuclear fuel foils and was used to test an industrial application of the technique. As a result a method based on sputter deposition and erosion can be presented, that allows to clean as well as to coat the surface of monolithic U-Mo nuclear fuel foils in excellent quality. It can be included at any time into the manufacturing chain for U-Mo fuel elements, which is currently being developed.
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A comparison of plasma in laser and hybrid laser-magnetron SiC deposition systems
Czech Academy of Sciences Publication Activity Database
Novotný, Michal; Bulíř, Jiří; Lančok, Ján; Jelínek, Miroslav
2007-01-01
Roč. 4, - (2007), S1017-S1021 ISSN 1612-8850 R&D Projects: GA AV ČR KJB1010417; GA ČR GA202/06/0216 Institutional research plan: CEZ:AV0Z10100522 Keywords : laser ablation * magnetron sputtering * optical emission spectroscopy Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.132, year: 2007
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Tian, Jiting; Zhou, Wei; Feng, Qijie; Zheng, Jian
2018-03-01
An unsolved problem in research of sputtering from metals induced by energetic large cluster ions is that molecular dynamics (MD) simulations often produce sputtering yields much higher than experimental results. Different from the previous simulations considering only elastic atomic interactions (nuclear stopping), here we incorporate inelastic electrons-atoms interactions (electronic stopping, ES) into MD simulations using a friction model. In this way we have simulated continuous 45° impacts of 10-20 keV C60 on a Ag(111) surface, and found that the calculated sputtering yields can be very close to the experimental results when the model parameter is appropriately assigned. Conversely, when we ignore the effect of ES, the yields are much higher, just like the previous studies. We further expand our research to the sputtering of Au induced by continuous keV C60 or Ar100 bombardments, and obtain quite similar results. Our study indicates that the gap between the experimental and the simulated sputtering yields is probably induced by the ignorance of ES in the simulations, and that a careful treatment of this issue is important for simulations of cluster-ion-induced sputtering, especially for those aiming to compare with experiments.
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International Nuclear Information System (INIS)
Kajbichev, A.V.; Pastukhov, Eh.A.; Kajbichev, I.A.; Aleshina, S.N.
2001-01-01
The electric field intensity for liquid metal evaporation is calculated. The correlation is established between the evaporating field intensity, ion sputtering and boiling temperatures for a number of metals (W, Nb, Mo, Ti, Co, Ni) with accounting for the fact that above-mentioned parameters characterize the expenditure of energy for removal of one-charge ions. It is shown that the dependence of evaporating field intensity on the number of the metal in the Periodic system is of oscillating nature. The disagreement between evaporating field intensity and Ar + ion sputtering for such metals as Cr, Ag, Cu can be explained by multi-charge type of sputtered particles [ru
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International Nuclear Information System (INIS)
Tafalla, D.; Cal, E. de la; Tabares, F.L.
1994-01-01
A plasma diagnostic based on the Laser Induced Fluorescence (LIF) technique has been set up in the Fusion Division at the CIEMAT. In a preliminary experiment, The density of sputtered chromium atoms produced in a neon glow discharge was measured. Firstly, the laser beam was characterized by calibration of its wavelength bandwidth and energy profile and Rayleigh scattering in N 2 was used for the optical system calibration. An absolute density of Cr atoms of n= 5x10''9 cm''-3 was obtained in discharges at 100 mA and pressure of 15 mTorr and a linear dependence of the LIF signal US. current was found. These values are in agreement with those expected from the tabulated sputtering yields and the thermalization and diffusion of the sputtered atoms into the Ne plasma
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Opto-galvanic effect on degenerate magnetic states of sputtered atoms in a glow discharge
International Nuclear Information System (INIS)
Zhechev, D; Steflekova, V
2014-01-01
The opto-galvanic response of some degenerate states of sputtered atoms to linearly- and circularly polarize light is studied. On the same optical transition both time-resolved- and amplitude opto-galvanic signals are found depending on the polarizations of light absorbed. The latter induces galvanic responses differing in opto-galvanic efficiency, time-evolution and sensitivity to discharge current and laser power. The differences are ascribed to the rate constants of the decay processes, characterizing aligned and oriented atoms
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Reutterer, Bernd; Traxler, Lukas; Bayer, Natascha; Drauschke, Andreas
2016-04-01
Selective Laser Sintering (SLS) is considered as one of the most important additive manufacturing processes due to component stability and its broad range of usable materials. However the influence of the different process parameters on mechanical workpiece properties is still poorly studied, leading to the fact that further optimization is necessary to increase workpiece quality. In order to investigate the impact of various process parameters, laboratory experiments are implemented to improve the understanding of the SLS limitations and advantages on an educational level. Experiments are based on two different workstations, used to teach students the fundamentals of SLS. First of all a 50 W CO2 laser workstation is used to investigate the interaction of the laser beam with the used material in accordance with varied process parameters to analyze a single-layered test piece. Second of all the FORMIGA P110 laser sintering system from EOS is used to print different 3D test pieces in dependence on various process parameters. Finally quality attributes are tested including warpage, dimension accuracy or tensile strength. For dimension measurements and evaluation of the surface structure a telecentric lens in combination with a camera is used. A tensile test machine allows testing of the tensile strength and the interpreting of stress-strain curves. The developed laboratory experiments are suitable to teach students the influence of processing parameters. In this context they will be able to optimize the input parameters depending on the component which has to be manufactured and to increase the overall quality of the final workpiece.
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Sputtering calculations with the discrete ordinated method
International Nuclear Information System (INIS)
Hoffman, T.J.; Dodds, H.L. Jr.; Robinson, M.T.; Holmes, D.K.
1977-01-01
The purpose of this work is to investigate the applicability of the discrete ordinates (S/sub N/) method to light ion sputtering problems. In particular, the neutral particle discrete ordinates computer code, ANISN, was used to calculate sputtering yields. No modifications to this code were necessary to treat charged particle transport. However, a cross section processing code was written for the generation of multigroup cross sections; these cross sections include a modification to the total macroscopic cross section to account for electronic interactions and small-scattering-angle elastic interactions. The discrete ordinates approach enables calculation of the sputtering yield as functions of incident energy and angle and of many related quantities such as ion reflection coefficients, angular and energy distributions of sputtering particles, the behavior of beams penetrating thin foils, etc. The results of several sputtering problems as calculated with ANISN are presented
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Deposition and characterization of sputtered hexaboride coatings
International Nuclear Information System (INIS)
Waldhauser, W.
1996-06-01
Hexaborides of the rare-earth elements ReB 6 are potential materials for cathode applications since they combine properties such as low work function, good electrical conductivity, high melting point as well as low volatility at high temperatures. Due to their high hardness and colorations ranging from blue to purple these compounds are also considered for applications to coatings for decoration of consumer products. At present, either rods of sintered LaB 6 or single LaB 6 crystals are indirectly heated to induce emission. In this workboride coatings were deposited onto various substrates employing non-reactive magnetron sputtering from LaB 6 , CeB 6 , SmB 6 and YB 6 targets. Coatings deposited were examined using scanning electron microscopy, X-ray diffraction, electron probe microanalysis. Vickers microhardness, colorimeter and spectroscopic ellipsometry measurements. Electron emission characteristics of the coatings were studied by the thermionic emission and the contact potential method. After optimization of the sputtering parameters fine-columnar or partially amorphous films with atomic ratios of boron to metal in the order of 5 to 7.5 were obtained. The tendency to form the corresponding hexaboride phase decreases from LaB 6 , CeB 6 and SmB 6 to YB 6 . The work function was measured to be in the range of 2.6 to 3.3 eV. Vickers microhardness values lie between 1500 and 2000 HVO.01. LaB 6 coatings showed the most pronounced visual color impression corresponding to dark violet. The results obtained indicate that sputtered hexaboride films are well suited for decorative and thermionic applications. (author)
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International Nuclear Information System (INIS)
Yu Mingpeng; Qiu Hong; Chen Xiaobai; Wu Ping; Tian Yue
2008-01-01
Ni films were deposited on SiO 2 /Si(100) substrates at 300 K and 573 K by oblique-angle sputtering and conventional sputtering. The films deposited at 300 K mainly have a [110] crystalline orientation in the growing direction whereas those deposited at 573 K grow with a [111] crystalline orientation in the growing direction. The film prepared only at 300 K by oblique-angle sputtering grows with a weakly preferential orientation along the incidence direction of the sputtered Ni atoms. All the films grow with thin columnar grains perpendicular to the substrate surface. The grain size of the films sputter-deposited obliquely is larger than that of the films sputter-deposited conventionally. The grain size of the Ni film does not change markedly with the deposition temperature. The film deposited at 573 K by oblique-angle sputtering has the highest saturation magnetization. For the conventional sputtering, the coercivity of the Ni film deposited at 573 K is larger than that of the film deposited at 300 K. However, for the oblique-angle sputtering, the coercivity of the Ni film is independent of the deposition temperature. All the Ni films exhibit an isotropic magnetization characteristic in the film plane
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Transport theory of sputtering I: Depth of origin of sputtered atoms
International Nuclear Information System (INIS)
Zhang, Zhu Lin
1999-01-01
Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error m≥0. The former even may be only about one half of the latter as long as m=0
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Sputtering induced surface composition changes in copper-palladium alloys
International Nuclear Information System (INIS)
Sundararaman, M.; Sharma, S.K.; Kumar, L.; Krishnan, R.
1981-01-01
It has been observed that, in general, surface composition is different from bulk composition in multicomponent materials as a result of ion beam sputtering. This compositional difference arises from factors like preferential sputtering, radiation induced concentration gradients and the knock-in effect. In the present work, changes in the surface composition of copper-palladium alloys, brought about by argon ion sputtering, have been studied using Auger electron spectroscopy. Argon ion energy has been varied from 500 eV to 5 keV. Enrichment of palladium has been observed in the sputter-altered layer. The palladium enrichment at the surface has been found to be higher for 500 eV argon ion sputtering compared with argon ion sputtering at higher energies. Above 500 eV, the surface composition has been observed to remain the same irrespective of the sputter ion energy for each alloy composition. The bulk composition ratio of palladium to copper has been found to be linearly related to the sputter altered surface composition ratio of palladium to copper. These results are discussed on the basis of recent theories of alloy sputtering. (orig.)
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The effect of laser process parameters on microstructure and dilution rate of cladding coatings
Bin, Liu; Heping, Liu; Xingbin, Jing; Yuxin, Li; Peikang, Bai
2018-02-01
In order to broaden the range of application of Q235 steel, it is necessary to repair the surface of steel. High performance 316L stainless steel coating was successfully obtained on Q235 steel by laser cladding technology. The effect of laser cladding parameters on the geometrical size and appearance of single cladding layer was investigated. The experimental results show that laser current has an important influence on the surface morphology of single channel cladding. When the current is from 155A to 165A, the cladding coating becomes smooth. The laser current has an effect on the geometric cross section size and dilution rate of single cladding. The results revealed that with the rising of laser current, the width, height and depth of layer increase gradually. With the rising of laser current, the dilution rate of cladding layer is gradually increasing.
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Directory of Open Access Journals (Sweden)
H. R. Sagatelyan
2014-01-01
Full Text Available The article subject is a thin-film coating process using ion-plasma sputter deposition systems with magnetron sputtering targets. To improve coating thickness evenness of parts various manufacturers equip their systems with mechanisms for moving the coating parts, and sometimes the magnetrons. More specifically, the article concerns the ion-plasma sputtering process using a system equipped with a mechanism for providing a planetary movement of the coating parts in the plane perpendicular to the planes of two sputtering targets.The purpose of this work was to improve a distribution of the coating thickness evenness on the sputtering surface of the part. It is achieved through selection of the best combinations of kinematic and geometric factors that characterize a particular sputtering operation, depending on the size and position of the surface to be coated. These factors include a ratio between directions and frequencies of the self-rotation of satellite planetary gear, which holds a work piecesubstrate, and the translational motion i.e. planetary carrier rotation to carry the satellite; the angles of planes of the right and left magnetrons with respect to the system frontal plane. Since there is, essentially, a lack of mathematical models to perform the appropriate calculations for the considered type of system designs, a more specific aim of the article is to develop a technique to evaluate the uneven thickness of coatings provided by the systems of this type.To achieve this more specific purpose the analytical technique had been used, applying the postulates of analytical geometry and theoretical mechanics. The main results of the research described in the article are as follows:- mathematical models of dependencies of geometric and kinematic parameters, changing during the sputtering process and characterizing each considered point on the surface of the work piece, on the current position of the work piece in the structure of the planetary
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International Nuclear Information System (INIS)
Shang Shuo; Fearon, Eamonn; Wellburn, Dan; Sato, Taku; Edwardson, Stuart; Dearden, G; Watkins, K G
2011-01-01
The laser assisted direct write (LADW) method can be used to generate electrical circuitry on a substrate by depositing metallic ink and curing the ink thermally by a laser. Laser curing has emerged over recent years as a novel yet efficient alternative to oven curing. This method can be used in situ, over complicated 3D contours of large parts (e.g. aircraft wings) and selectively cure over heat sensitive substrates, with little or no thermal damage. In previous studies, empirical methods have been used to generate processing windows for this technique, relating to the several interdependent processing parameters on which the curing quality and efficiency strongly depend. Incorrect parameters can result in a track that is cured in some areas and uncured in others, or in damaged substrates. This paper addresses the strong need for a quantitative model which can systematically output the processing conditions for a given combination of ink, substrate and laser source; transforming the LADW technique from a purely empirical approach, to a simple, repeatable, mathematically sound, efficient and predictable process. The method comprises a novel and generic finite element model (FEM) that for the first time predicts the evolution of the thermal profile of the ink track during laser curing and thus generates a parametric map which indicates the most suitable combination of parameters for process optimization. Experimental data are compared with simulation results to verify the accuracy of the model.
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Properties of RF sputtered zinc oxide based thin films made from different targets
Energy Technology Data Exchange (ETDEWEB)
Martinez, M A; Herrero, J; Gutierrez, M T [Instituto de Energias Renovables, Madrid (Spain)
1994-01-01
The effect of deposition parameters on optoelectronic and structural properties of ZnO based thin films prepared by RF magnetron sputtering have been studied. Different targets (pure Zn, ZnO, Zn-Al (98/2 at%), ZnO-Al (98/2 at%), and ZnO-Al{sub 2}O{sub 3} (98/2 wt%)) have been investigated to compare resulting samples and establish the best target composition. From reactive sputtering, using a Zn-Al target, transparent conductive zinc oxide has been obtained at 380{sup o}C with E{sub g}=3.25-3.35 eV and {rho}=4.8x10{sup -4} {Omega}cm. Reduction of substrate temperature at 200{sup o}C has been possible by nonreactive sputtering from ZnO-Al and ZnO-Al{sub 2}O{sub 3} targets. The values of the energy gap and resistivity under these conditions are 3.30-3.35 eV and 1x10{sup -3} {Omega}cm respectively
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The accumulation of disorder, subject to saturation and sputter limitation, in ion irradiated solids
International Nuclear Information System (INIS)
Carter, G.; Webb, R.; Collins, R.
1978-01-01
The depth distribution of disorder and the depth integrated disorder produced by ion irradiation of solids is analysed theoretically as a function of increasing ion fluence when disorder saturation processes operate at all depths and the solid surface is continuously uniformly eroded by sputtering. The resulting defining equations are evaluated numerically for a Gaussian approximation to the disorder depth function with parameters appropriate to low, equal and high projectile:substrate mass ratio conditions, for several values of sputtering coefficient and effective atom displacement energy. It is shown that the form, if not the magnitude, of the integrated disorder/projectile fluence function is only weakly dependent upon these parameters. More meaningful comparison with depth resolved disorder functions is, however, possible and such a comparison is made for 100 keV Sb projectiles on a Si substrate. (author)
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Directory of Open Access Journals (Sweden)
Shanmugarajan B.
2016-08-01
Full Text Available Creep strength enhanced ferritic (CSEF steels are used in advanced power plant systems for high temperature applications. P92 (Cr–W–Mo–V steel, classified under CSEF steels, is a candidate material for piping, tubing, etc., in ultra-super critical and advanced ultra-super critical boiler applications. In the present work, laser welding process has been optimised for P92 material by using Taguchi based grey relational analysis (GRA. Bead on plate (BOP trials were carried out using a 3.5 kW diffusion cooled slab CO2 laser by varying laser power, welding speed and focal position. The optimum parameters have been derived by considering the responses such as depth of penetration, weld width and heat affected zone (HAZ width. Analysis of variance (ANOVA has been used to analyse the effect of different parameters on the responses. Based on ANOVA, laser power of 3 kW, welding speed of 1 m/min and focal plane at −4 mm have evolved as optimised set of parameters. The responses of the optimised parameters obtained using the GRA have been verified experimentally and found to closely correlate with the predicted value.
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Studi Disorder Lapisan Tipis Amorf Silikon Karbon (A-Sic:H Hasil Deposisi Metode Dc Sputtering
Directory of Open Access Journals (Sweden)
Rosari Saleh
2002-08-01
Full Text Available Disorder Study of Amorphous Silicon Carbon (a-SiC:H Films Deposited by DC Sputtering Method. Disorder amorphous network of amorphous silicon carbon (a-SiC:H films has been investigated for films prepared by dc sputtering method. The films were deposited using silicon target in argon and methane gas mixtures. The optical absorption coefficients have been performed by UV-VIS (ultra violet-visible reflectance and transmittance spectroscopy. Disorder parameter has been obtained from the optical absorption coefficient α (E using Tauc plot. Increasing methane flow rate has an effect on increasing Tauc gap and decreasing disorder parameter. The amorphous network of the films tends to be more disorder with increasing methane flow rate. The relation of disorder amorphous network with structural and compositional properties will be discussed.
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MD simulation of cluster formation during sputtering
International Nuclear Information System (INIS)
Muramoto, T.; Okai, M.; Yamashita, Y.; Yorizane, K.; Yamamura, Y.
2001-01-01
The cluster ejection due to cluster impact on a solid surface is studied through molecular dynamics (MD) simulations. Simulations are performed for Cu cluster impacts on the Cu(1 1 1) surface for cluster energy 100 eV/atom, and for clusters of 6, 13, 28 and 55 atoms. Interatomic interactions are described by the AMLJ-EAM potential. The vibration energy spectrum is independent of the incident cluster size and energy. This comes from the fact that sputtered clusters become stable through the successive fragmentation of nascent large sputtered clusters. The vibration energy spectra for large sputtered clusters have a peak, whose energy corresponds to the melting temperature of Cu. The exponent of the power-law fit of the abundance distribution and the total sputtering yield for the cluster impacts are higher than that for the monatomic ion impacts with the same total energy, where the exponent δ is given by Y n ∝n δ and Y n is the yield of sputtered n-atom cluster. The exponent δ follows a unified function of the total sputtering yield, which is a monotonic increase function, and it is nearly equal to δ ∼ -3 for larger yield
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Energy Technology Data Exchange (ETDEWEB)
Tafalla, D.; Cal, E. de la; Tabares, F. L.
1994-07-01
A plasma diagnostic based on the Laser Induced Fluorescence (LIF) technique has been set up in the Fusion Division at the CIEMAT. In a preliminary experiment, the density of sputtered chromium atoms produced in a neon glow discharge was measured. Firstly, the laser beam was characterized by calibration of its wavelength, bandwidth and energy profile and Rayleigh scattering in N2 was used for the optical system calibration. An absolute density of Cr atoms of n {approx} 5x10 cm was obtained in discharges at 100 mA and pressure of 15 mTorr and a linear dependence of the LIF signal us. current was found. These values are in agreement with those expected from the tabulated sputtering yields and the thermalization and diffusion of the sputtered atoms into the Ne plasma. (Author) 19 refs.
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Experimental and analytical study of the sputtering phenomena
International Nuclear Information System (INIS)
Howard, P.A.
1976-03-01
One form of the sputtering phenomena, the heat-transfer process that occurs when an initially hot vertical surface is cooled by a falling liquid film, was examined from a new experimental approach. The sputtering front is the lowest wetted position on the vertical surface and is characterized by a short region of intense nucleate boiling. The sputtering front progresses downward at nearly a constant rate, the surface below the sputtering front being dry and almost adiabatic. This heat-transfer process is of interest in the analysis of some of the performance aspects of emergency core-cooling systems of light-water reactors. An experimental apparatus was constructed to examine the heat-transfer characteristics of a sputtering front. In the present study, a heat source of sufficient intensity was located immediately below the sputtering front, which prevented its downward progress, thus permitting detailed measurements of steady-state surface temperatures throughout a sputtering front. Experimental evidence showed the sputtering front to correspond to a critical heat-flux (CHF) phenomenon. Data were obtained with water flow rates of 350-1600 lb/sub m//hr-ft and subcoolings of 40-140 0 F on a 3 / 8 -in. solid copper rod at 1 atm. A two-dimensional analytical model was developed to describe a stationary sputtering front where the wet-dry interface corresponds to a CHF phenomena and the dry zone is adiabatic. This model is nonlinear because of the temperature dependence of the heat-transfer coefficient in the wetted region and has yielded good agreement with data. A simplified one-dimensional approximation was developed which adequately describes these data. Finally, by means of a coordinate transformation and additional simplifying assumptions, this analysis was extended to analyze moving sputtering fronts, and reasonably good agreement with reported data was shown
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Measurements of beryllium sputtering yields at JET
Jet-Efda Contributors Stamp, M. F.; Krieger, K.; Brezinsek, S.
2011-08-01
The lifetime of the beryllium first wall in ITER will depend on erosion and redeposition processes. The physical sputtering yields for beryllium (both deuterium on beryllium (Be) and Be on Be) are of crucial importance since they drive the erosion process. Literature values of experimental sputtering yields show an order of magnitude variation so predictive modelling of ITER wall lifetimes has large uncertainty. We have reviewed the old beryllium yield experiments on JET and used current beryllium atomic data to produce revised beryllium sputtering yields. These experimental measurements have been compared with a simple physical sputtering model based on TRIM.SP beryllium yield data. Fair agreement is seen for beryllium yields from a clean beryllium limiter. However the yield on a beryllium divertor tile (with C/Be co-deposits) shows poor agreement at low electron temperatures indicating that the effect of the higher sputtering threshold for beryllium carbide is important.
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International Nuclear Information System (INIS)
Larciprete, M.C.; Passeri, D.; Michelotti, F.; Paoloni, S.; Sibilia, C.; Bertolotti, M.; Belardini, A.; Sarto, F.; Somma, F.; Lo Mastro, S.
2005-01-01
We investigated second order optical nonlinearity of zinc oxide thin films, grown on glass substrates by the dual ion beam sputtering technique under different deposition conditions. Linear optical characterization of the films was carried out by spectrophotometric optical transmittance and reflectance measurements, giving the complex refractive index dispersion. Resistivity of the films was determined using the four-point probe sheet resistance method. Second harmonic generation measurements were performed by means of the Maker fringes technique where the fundamental beam was originated by nanosecond laser at λ=1064 nm. We found a relatively high nonlinear optical response, and evidence of a dependence of the nonlinear coefficient on the deposition parameters for each sample. Moreover, the crystalline properties of the films were investigated by x-ray diffraction measurements and correlation with second order nonlinearity were analyzed. Finally, we investigated the influence of the oxygen flow rate during the deposition process on both the second order nonlinearity and the structural properties of the samples
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Mallur, Pavan S; Tajudeen, Bobby A; Aaronson, Nicole; Branski, Ryan C; Amin, Milan R
2011-03-01
Although the potassium titanyl phosphate (KTP) laser is versatile, the variability in laser parameters for laryngeal pathologies and the lack of clinical efficacy data remain problematic. We provide preliminary data regarding these parameters for benign lesion regression. In addition, we describe a novel method for the quantification of the effects of the KTP laser on vocal fold (VF) lesions. Retrospective chart review. Images were captured from examinations before and after in-office KTP treatment in patients with a range of benign lesions. Laser settings were noted for each patient. Imaging software was then used to calculate a ratio of lesion area to VF length. Ten percent of images were requantified to determine inter-rater reliability. Thirty-two patients underwent 47 procedures for lesions including hemorrhagic polyp, nonhemorrhagic polyp, vocal process granuloma, Reinke's edema, cyst/pseudocyst, leukoplakia, and squamous cell carcinoma in situ. No statistically significant differences were observed with regard to the laser parameters used as a function of lesion type. Regardless, by 1 month following treatment, all lesions had significantly decreased in size, except nonhemorrhagic polyps. Similar data were obtained at 2-month follow-up. We then compared the pre-KTP lesion size with the smallest lesion size quantified during the 1-year follow-up period. All lesions were significantly smaller, with the exception of Reinke's edema. Inter-rater reliability was quite good. KTP laser effectively reduced VF lesion size, irrespective of the laser parameters used. In addition, our quantification method for lesion size appeared to be both viable and reliable. Copyright © 2011 The American Laryngological, Rhinological, and Otological Society, Inc.
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Czech Academy of Sciences Publication Activity Database
Novotný, Michal; Bulíř, Jiří; Pokorný, Petr; Bočan, Jiří; Fitl, Přemysl; Lančok, Ján; Musil, Jindřich
2010-01-01
Roč. 12, č. 3 (2010), 697-700 ISSN 1454-4164 R&D Projects: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324 Institutional research plan: CEZ:AV0Z10100522 Keywords : reactive magnetron sputtering * alumina * plasma spectroscopy * mass spectroscopy * optical emission spectroscopy Subject RIV: BH - Optics, Masers, Lasers Impact factor: 0.412, year: 2010
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Energy Technology Data Exchange (ETDEWEB)
Misiano, C; Simonetti, E [Selenia S.p.A., Rome (Italy)
1977-06-01
The co-sputtering of two dielectric materials with indices of refraction as widely different as possible has been investigated with the aim of obtaining both homogeneous films with an intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module is described which has been especially designed, with two separate cathodes and two independent tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO/sub 2/, TiO2 and SiO/sub 2/ targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness are reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest are discussed.
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Optimization of CO2 laser cutting parameters on Austenitic type Stainless steel sheet
Parthiban, A.; Sathish, S.; Chandrasekaran, M.; Ravikumar, R.
2017-03-01
Thin AISI 316L stainless steel sheet widely used in sheet metal processing industries for specific applications. CO2 laser cutting is one of the most popular sheet metal cutting processes for cutting of sheets in different profile. In present work various cutting parameters such as laser power (2000 watts-4000 watts), cutting speed (3500mm/min - 5500 mm/min) and assist gas pressure (0.7 Mpa-0.9Mpa) for cutting of AISI 316L 2mm thickness stainless sheet. This experimentation was conducted based on Box-Behenken design. The aim of this work is to develop a mathematical model kerf width for straight and curved profile through response surface methodology. The developed mathematical models for straight and curved profile have been compared. The Quadratic models have the best agreement with experimental data, and also the shape of the profile a substantial role in achieving to minimize the kerf width. Finally the numerical optimization technique has been used to find out best optimum laser cutting parameter for both straight and curved profile cut.
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Panneerselvam, Vengatesh; Chinnakutti, Karthik Kumar; Thankaraj Salammal, Shyju; Soman, Ajith Kumar; Parasuraman, Kuppusami; Vishwakarma, Vinita; Kanagasabai, Viswanathan
2018-04-01
In this study, pristine nickel oxide (NiO), copper-doped NiO (Cu-NiO) and vanadium-doped NiO (V-NiO) thin films were deposited using reactive RF magnetron co-sputtering as a function of dopant sputtering power. Cu (0-8 at%) and V (0-1 at%) were doped into the NiO lattice by varying the sputtering power of Cu and V in the range of 5-15 W. The effect of dopant concentration on optoelectronic behavior is investigated by UV-Vis-NIR spectrophotometer and Hall measurements. XRD analysis showed that the preferred orientation of the cubic phase for undoped NiO changes from (200) to (111) plane when the sputtering parameters are varied. The observed changes in the lattice parameters and bonding states of the doped NiO indicate the substitution of Ni ions by monovalent Cu and trivalent V ions. The optical bandgap of pristine NiO, Cu-NiO, and V-NiO was found to be 3.6, 3.45, and 3.05 eV, respectively, with decreased transmittance and resistivity. Further analysis using SEM and AFM described the morphological behavior of doped NiO thin films and Raman spectroscopy indicated the structural changes on doping. These findings would be helpful in fabricating solid-state solar cells using doped NiO as efficient hole transporting material.
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Laser welding parameters for manufacturing iridium-192 (Ir-192) source
International Nuclear Information System (INIS)
Anung Pujiyanto; Moch Subechi; Hotman Lubis; Diandono KY
2013-01-01
Number of cervical cancer patients in Indonesia is growing every year. One of cervical cancer treatment was fairly effective use brachytherapy treatment with radioisotope sources of iridium-192. Manufacturing of iridium sources for brachytherapy can be done by incorporating the iridium-192 into stainless steel microcapsules then welding using laser welder which the quality of the welding of iridium source (Ir-192) was determined by the welding parameters such as full power, energy frequency, average power and speed. Based on the result of leakage test using pressure -20 inch Hg and tensile test 2.5 bar showed the welding parameters III and IV did not have leakage and damaged. So that parameters III and IV are recommended to be applied to Ir-192 HDR's source. (author)
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Fiber facet gratings for high power fiber lasers
Vanek, Martin; Vanis, Jan; Baravets, Yauhen; Todorov, Filip; Ctyroky, Jiri; Honzatko, Pavel
2017-12-01
We numerically investigated the properties of diffraction gratings designated for fabrication on the facet of an optical fiber. The gratings are intended to be used in high-power fiber lasers as mirrors either with a low or high reflectivity. The modal reflectance of low reflectivity polarizing grating has a value close to 3% for TE mode while it is significantly suppressed for TM mode. Such a grating can be fabricated on laser output fiber facet. The polarizing grating with high modal reflectance is designed as a leaky-mode resonant diffraction grating. The grating can be etched in a thin layer of high index dielectric which is sputtered on fiber facet. We used refractive index of Ta2O5 for such a layer. We found that modal reflectance can be close to 0.95 for TE polarization and polarization extinction ratio achieves 18 dB. Rigorous coupled wave analysis was used for fast optimization of grating parameters while aperiodic rigorous coupled wave analysis, Fourier modal method and finite difference time domain method were compared and used to compute modal reflectance of designed gratings.
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Khan, M. M. A.; Romoli, L.; Fiaschi, M.; Dini, G.; Sarri, F.
2011-02-01
This paper presents an experimental design approach to process parameter optimization for the laser welding of martensitic AISI 416 and AISI 440FSe stainless steels in a constrained overlap configuration in which outer shell was 0.55 mm thick. To determine the optimal laser-welding parameters, a set of mathematical models were developed relating welding parameters to each of the weld characteristics. These were validated both statistically and experimentally. The quality criteria set for the weld to determine optimal parameters were the minimization of weld width and the maximization of weld penetration depth, resistance length and shearing force. Laser power and welding speed in the range 855-930 W and 4.50-4.65 m/min, respectively, with a fiber diameter of 300 μm were identified as the optimal set of process parameters. However, the laser power and welding speed can be reduced to 800-840 W and increased to 4.75-5.37 m/min, respectively, to obtain stronger and better welds.
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Sputtering and inelastic processes
International Nuclear Information System (INIS)
Baranov, I.A.; Tsepelevic, S.O.
1987-01-01
Experimental data and models of a new type of material sputtering with ions of relatively high energies due to inelastic (electron) processes are reviewed. This area of investigations began to develop intensively during the latest years. New experimental data of the authors on differential characteristics of ultradisperse gold and americium dioxide layers with fission fragments are given as well. Practical applications of the new sputtering type are considered as well as setup of possibl experiments at heavy multiply charged ion accelerators
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Biopolymer nanostructures induced by plasma irradiation and metal sputtering
Energy Technology Data Exchange (ETDEWEB)
Slepička, P., E-mail: petr.slepicka@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Juřík, P. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Malinský, P.; Macková, A. [Nuclear Physics Institute, Academy of Sciences of the Czech Republic, Rez, Prague 25068 (Czech Republic); Faculty of Science, J.E. Purkyně University, Ústí nad Labem (Czech Republic); Kasálková, N. Slepičková; Švorčík, V. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)
2014-08-01
Modification based on polymer surface exposure to plasma treatment exhibits an easy and cheap technique for polymer surface nanostructuring. The influence of argon plasma treatment on biopolymer poly(L-lactide acid (PLLA) will be presented in this paper. The combination of Ar{sup +} ion irradiation, consequent sputter metallization (platinum) and thermal annealing of polymer surface will be summarized. The surface morphology was studied using atomic force microscopy. The Rutherford Backscattering Spectroscopy and X-ray Photoelectron Spectroscopy were used as analytical methods. The combination of plasma treatment with consequent thermal annealing and/or metal sputtering led to the change of surface morphology and its elemental ratio. The surface roughness and composition has been strongly influenced by the modification parameters and metal layer thickness. By plasma treatment of polymer surface combined with consequent annealing or metal deposition can be prepared materials applicable both in tissue engineering as cell carriers, but also in integrated circuit manufacturing.
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Sputtering materials for VLSI and thin film devices
Sarkar, Jaydeep
2010-01-01
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p
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Effects of surface relief on the high-dose sputtering of amorphous silicon and graphite by Ar ions
International Nuclear Information System (INIS)
Shulga, V.I.
2014-01-01
The effects of ion-induced surface relief on high-dose sputtering of amorphous silicon and graphite targets have been studied using binary-collision computer simulation. The relief was modeled as a wavelike surface along two mutually perpendicular surface axes (a 3D hillock-and-valley relief). Most simulations were carried out for normally-incident 30-keV Ar ions. It was shown that the surface relief can both increase and decrease the sputtering yield compared to that for a flat surface. The results of simulations suggest that stabilization of the surface relief is possible even in the absence of any smoothing processes such as surface diffusion of atoms. Effects of a surface relief on the experimentally measurable angular and energy distributions of sputtered atoms are also considered. The fitting parameters of these distributions are shown to be non-monotonic functions of the relief aspect ratio. The angular distribution of atoms sputtered from a relief surface is modulated to a great extent by the shape of the relief. For a rough surface, azimuthal isotropy of the angular distribution of sputtered atoms was found, but at high bombarding energies only
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International Nuclear Information System (INIS)
Tafalla, D.; Cal, E. de la; Tabares, F. L.
1994-01-01
A plasma diagnostic based on the Laser Induced Fluorescence (LIF) technique has been set up in the Fusion Division at the CIEMAT. In a preliminary experiment, the density of sputtered chromium atoms produced in a neon glow discharge was measured. Firstly, the laser beam was characterized by calibration of its wavelength, bandwidth and energy profile and Rayleigh scattering in N2 was used for the optical system calibration. An absolute density of Cr atoms of n ∼ 5x10 cm was obtained in discharges at 100 mA and pressure of 15 mTorr and a linear dependence of the LIF signal us. current was found. These values are in agreement with those expected from the tabulated sputtering yields and the thermalization and diffusion of the sputtered atoms into the Ne plasma. (Author) 19 refs
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Thermochromic VO2 thin films deposited by magnetron sputtering for smart window applications
Fortier, Jean-Philippe
"Smart" windows are a perfect innovative example of technology that reduces our energy dependence and our impact on the environment while saving on the economical point of view. With the use of vanadium dioxide (VO2), a thermochromic compound, and this, as a thin coating, it would in fact be possible to control the sun's transmission of infrared light (heat) as a function of the surrounding environment temperature. In other words, its optical behavior would allow a more effective management of heat exchanges between a living venue and the outdoor environment. However, this type of window is still in a developmental stage. First, the oxide's deposition is not simple in nature. Based on a conventional deposition technique called magnetron sputtering mainly used in the fenestration industry, several factors such as the oxygen concentration and the substrate temperature during deposition can affect the coating's thermochromic behavior, and this, by changing its composition and crystallinity. Other control parameters such as the deposition rate, the pressure in the sputtering chamber and the choice of substrate may also modify the film microstructure, thereby varying its optical and electrical properties. In addition, several issues still persist as to its commercial application. For starters, the material's structural transition, related to the change of its optical properties, only occurs around 68°C. In addition, its low transparency and natural greenish colour are not visually appealing. Then, to this day, the deposition temperature required to crystallize and form the thermochromic oxide remains an obstacle for a possible large-scale application. Ultimately, although the material's change in temperature has been shown to be advantageous in situations of varying climate, the existing corrective solutions to these issues generate a deterioration of the thermochromic behavior. With no practical expertise on the material, this project was undertaken with certain
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Effect of Irradiation Parameters on Morphology of Polishing DF2 (AISI-O1 Surface by Nd:YAG Laser
Directory of Open Access Journals (Sweden)
Wei Guo
2007-01-01
Full Text Available Pulse Nd:YAG laser was used to polish DF2 cold work steel. Influence of irradiation parameters on the 3D surface morphology was studied by 3D profilometer, scanning electron microscopy (SEM, and atomic force microscope (AFM. Results among the tests showed when DF2 specimens were irradiated with parameters of (i laser input energy P=1 J, (ii pulse feedrate=300 mm/min, (iii pulse duration (PD =3 milliseconds, and (iv pulse frequency f=20∼25 Hz, laser polishing of DF2 cold work steel seemed to be successful.
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Large Area Sputter Coating on Glass
Katayama, Yoshihito
Large glass has been used for commercial buildings, housings and vehicles for many years. Glass size for flat displays is getting larger and larger. The glass for the 8th generation is more than 5 m2 in area. Demand of the large glass is increasing not only in these markets but also in a solar cell market growing drastically. Therefore, large area coating is demanded to plus something else on glass more than ever. Sputtering and pyrolysis are the major coating methods on large glass today. Sputtering process is particularly popular because it can deposit a wide variety of materials in good coating uniformity on the glass. This paper describes typical industrial sputtering system and recent progress in sputtering technology. It also shows typical coated glass products in architectural, automotive and display fields and comments on their functions, film stacks and so on.
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Reactive sputter deposition of boron nitride
International Nuclear Information System (INIS)
Jankowski, A.F.; Hayes, J.P.; McKernan, M.A.; Makowiecki, D.M.
1995-10-01
The preparation of fully dense, boron targets for use in planar magnetron sources has lead to the synthesis of Boron Nitride (BN) films by reactive rf sputtering. The deposition parameters of gas pressure, flow and composition are varied along with substrate temperature and applied bias. The films are characterized for composition using Auger electron spectroscopy, for chemical bonding using Raman spectroscopy and for crystalline structure using transmission electron microscopy. The deposition conditions are established which lead to the growth of crystalline BN phases. In particular, the growth of an adherent cubic BN coating requires 400--500 C substrate heating and an applied -300 V dc bias
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Advanced capabilities and applications of a sputter-RBS system
International Nuclear Information System (INIS)
Brijs, B.; Deleu, J.; Beyer, G.; Vandervorst, W.
1999-01-01
In previous experiments, sputter-RBS 1 has proven to be an ideal tool to study the interaction of low energy ions. This contribution employs the same methodology to identify surface contamination induced during sputtering and to the determine absolute sputter yields. In the first experiment ERDA analysis was used to study the evolution of Hydrogen contamination during sputter-RBS experiments. Since the determination of Hydrogen concentration in very thin near surface layers is frequently limited by the presence of a strong surface peak of Hydrogen originating from adsorbed contamination of the residual vacuum, removal of this contamination would increase the sensitivity for Hydrogen detection in the near sub surface drastically. Therefore low energy (12 keV) Argon sputtering was used to remove the Hydrogen surface peak. However enhanced Hydrogen adsorption was observed related to the Ar dose. This experiment shows that severe vacuum conditions and the use of high current densities/sputter yields are a prerequisite for an efficient detection of Hydrogen in the near surface layers. In the second experiment, an attempt was made to determine the sputter yield of Cu during low energy (12 keV) Oxygen bombardment. In order to determine the accumulated dose of the low energy ion beam, a separate Faraday cup in combination with a remote controlled current have been added to the existing sputter-RBS set-up. Alternating sputtering and RBS analysis seem to be an adequate tool for the determination of the absolute sputter yield of Cu and this as well in the as under steady state conditions
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Reactive dual magnetron sputtering for large area application
International Nuclear Information System (INIS)
Struempfel, J.
2002-01-01
Production lines for large area coating demand high productivity of reactive magnetron sputtering processes. Increased dynamic deposition rates for oxides and nitrides were already obtained by using of highly powered magnetrons in combination with advanced sputter techniques. However, besides high deposition rates the uniformity of such coatings has to be carefully considered. First the basics of reactive sputtering processes and dual magnetron sputtering are summarized. Different methods for process stabilization and control are commonly used for reactive sputtering. The Plasma Emission Monitor (PE M) offers the prerequisite for fast acting process control derived from the in-situ intensity measurements of a spectral line of the sputtered target material. Combined by multiple Plasma Emission Monitor control loops segmented gas manifolds are able to provide excellent thin film uniformity at high deposition rates. The Dual Magnetron allows a broad range of processing by different power supply modes. Medium frequency, DC and pulsed DC power supplies can be used for high quality layers. Whereas the large area coating of highly isolating layers like TiO 2 or SiO 2 is dominated by MF sputtering best results for coating with transparent conductive oxides are obtained by dual DC powering of the dual magnetron arrangement. (Author)
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International Nuclear Information System (INIS)
Schaefer, B.; Luebbecke, M.; Mann, K.
2006-01-01
The suitability of the Hartmann-Shack technique for the determination of the propagation parameters of a laser beam is faced against the well known caustic approach according to the ISO 11146 standard. A He-Ne laser (543 nm) was chosen as test beam, both in its fundamental mode as well as after intentional distortion, introducing a moderate amount of spherical aberration. Results are given for the most important beam parameters M 2 , divergence, and beam widths, indicating an agreement of better than 10% and for adapted beam diameter <5%. Furthermore, the theoretical background, pros and cons, as well as some features of the software implementation for the Hartmann-Shack sensor are briefly reviewed
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The optical properties and applications of AlN thin films prepared by a helicon sputtering system
Chiu, W Y; Kao, H L; Jeng, E S; Chen, J S; Jaing, C C
2002-01-01
AlN thin films were grown on SiO sub 2 /Si and quartz substrates using a helicon sputtering system. The dependence of film quality on growth parameters, such as total sputtering pressure, substrate temperature, and nitrogen concentration has been studied. There is a good correlation of thin film crystallinity addressed by x-ray diffraction (XRD) and spectroscopic ellipsometer. The optimized films exhibit highly oriented, with only (002) peak shown in a theta-2 theta scan XRD pattern, and extremely smooth surface with rms roughness of 2 Aa. The extinction coefficient of the film was 4x10 sup - sup 4 , which is lower than that of AlN films grown by conventional sputtering. Double-layer antireflection (DLAR) coating using AlN and Al sub 3 O sub 3 grown on quartz has been demonstrated. The transmittance of DLAR was high as 96% compared to 93% of bare substrates with the measurement error less than 0.2%. AlN films prepared by Helicon sputtering thus are potential for optical application.
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Measurement of partial coefficients of sputtering of titanium atoms from TiC and TiN coatings
International Nuclear Information System (INIS)
Vychegzhanin, G.A.; Gribanov, Yu.A.; Dikij, N.P.; Zhmurin, P.N.; Letuchij, A.N.; Matyash, P.P.; Sidokur, P.I.; Shono, D.A.
1989-01-01
Method of laser fluorescent spectroscopy was used to measure partial coefficients of sputtering of titanium atoms from TiC and TiN coatings under irradiation by 1 keV hydrogen ions. Irradiation was conducted in a plant with reflective discharge. Investigation of damaged layer in irradiated samples was conducted. The presence of near-the-surface layer enrichment with titanium atoms was revealed both in TiC and TiN samples. 12 refs.; 4 figs
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Donkov, N.; Mateev, E.; Safonov, V.; Zykova, A.; Yakovin, S.; Kolesnikov, D.; Sudzhanskaya, I.; Goncharov, I.; Georgieva, V.
2014-12-01
Ta2O5 ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5 coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5 coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5 ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes
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Fuzzy tungsten in a magnetron sputtering device
Energy Technology Data Exchange (ETDEWEB)
Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)
2016-11-15
Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.
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Fuzzy tungsten in a magnetron sputtering device
International Nuclear Information System (INIS)
Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.
2016-01-01
Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24 m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24 m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.
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Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering
Energy Technology Data Exchange (ETDEWEB)
Besland, M P; Barroy, P R J; Richard-Plouet, M; Tessier, P Y; Brohan, L; Djouadi, M A [Universite de Nantes - Institut des Materiaux Jean Rouxel, UMR CNRS 6502, 2, rue de la Houssiniere BP32229, 44322 Nantes Cedex (France); Borderon, C; Tacon, S Le; Averty, D; Gundel, H W [Institut de Recherche en Electrotechnique et Electronique de Nantes Atlantique, UPRES-EA 1770, IREENA, Universite de Nantes, 2, rue de la Houssiniere, BP 92208, 44322 Nantes Cedex (France)], E-mail: Marie-Paule.Besland@cnrs-imn.fr
2008-01-15
Well crystallized BLT thin films were deposited by RF magnetron sputtering using a target of Aurivillius phase Bi{sub 3.25}La{sub 0.75}Ti{sub 3}O{sub 12}(BLT{sub 0,75}), elaborated in our institute. RF sputtering experiments were performed at room temperature with an argon/oxygen mixture, in a pressure range of 20-50 mTorr. Optimisation of the plasma parameters, namely deposition pressure, RF power and oxygen content in the gas phase, allows obtaining BLT films with a chemical composition close to Bi{sub 3.25}La{sub 0.75}Ti{sub 3}O{sub 12}. After ex-situ annealing under oxygen atmosphere at 650 deg. C, BLT films deposited on Pt/TiO{sub 2}/SiO{sub 2}/Si (multilayer) substrates exhibit well defined rod-like grains morphology. A two step deposition process appeared to be necessary in order to reach satisfying dielectric properties. The effect of the plasma parameters on the chemical composition and electrical properties are presented and discussed.
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Li, Tingting; Fu, Xing; Dorantes-Gonzalez, Dante J.; Chen, Kun; Li, Yanning; Wu, Sen
2015-10-01
Laser-induced Surface Acoustic Waves (LSAWs) has been promisingly and widely used in recent years due to its rapid, high accuracy and non-contact evaluation potential of layered and thin film materials. For now, researchers have applied this technology on the characterization of materials' physical parameters, like Young's Modulus, density, and Poisson's ratio; or mechanical changes such as surface cracks and skin feature like a melanoma. While so far, little research has been done on providing practical guidelines on pulse laser parameters to best generate SAWs. In this paper finite element simulations of the thermos-elastic process based on human skin model for the generation of LSAWs were conducted to give the effects of pulse laser parameters have on the generated SAWs. And recommendations on the parameters to generate strong SAWs for detection and surface characterization without cause any damage to skin are given.
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Matted-fiber divertor tagets for sputter resistance
International Nuclear Information System (INIS)
Gierszewski, P.J.; Todreas, N.E.; Mikic, B.; Yang, T.F.
1981-06-01
Reductions in net sputtering yields can be obtained by altering the surface topography to maximize redeposition of sputtered atoms. A simple analysis is used to indicate a potential reduction by a factor of 2 to 5 for matted fiber divertor targets, relatively independent of incident, reflected and sputtered atom distributions. The fiber temperature is also shown to be acceptable, even up to 10 MW/m 2 , for reasonably combinations of materials, fiber diameter and fiber spacing
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Sputtering of a silicon surface: Preferential sputtering of surface impurities
Czech Academy of Sciences Publication Activity Database
Nietiadi, M.L.; Rosandi, Y.; Lorinčík, Jan; Urbassek, H.M.
-, č. 303 (2013), s. 205-208 ISSN 0168-583X Institutional support: RVO:67985882 Keywords : Sputtering * Molecular dynamics * SIMS Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 1.186, year: 2013
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Effect of fiber laser parameters on laser welded AZ31B Magnesium alloys
Directory of Open Access Journals (Sweden)
Mat Salleh Naqiuddin
2017-01-01
Full Text Available Recently, the usage of Magnesium (Mg alloys has been hugely applied in the industrial application such as in automotive, marine, and electronic due to its advantages of recyclability and lightweight. This alloys required low heat input to be weld since it is easily evaporated due to the Magnesium Oxide (MgO at the surface and it also possesses lower melting point compared to steel. Laser welding is more convenient to weld Mg alloys due to its high power and lower heat input. AZ31B was selected since it has strong mechanical properties among others Mg alloys due to the major alloying elements; Aluminium (Al and Zinc (Zn. Low power fiber laser machine with wavelength of 900 nm was used in this experiment. The intention of this work was to investigate the effect of low power fiber laser parameters and effect of shielding gas on weld penetration and microstructure. Another aim in this work was to produce the joint for this thin sheets metal. Penetration depth and microstructure evaluation were emphasized in the analysis section. Bead-on-Plate (BOP and laser lap welding was conducted on AZ31B with thicknesses of 1.0 mm and 0.6 mm for feasibility study using pulsed wave (PW mode. Defocusing features was used in order to find better focal position, which has less occurrence of evaporation (underfill. The effect of different angle of irradiation was also investigated. Two types of shielding gases, Argon (Ar and Nitrogen (N2 were used in order to study the effect of shielding gas. Lastly, the effect of pulsed energy on penetration types and depth of BOP welded samples was investigated. Focus point was found at focal length of 156 mm with 393.75 μm. For BOP experiment, higher pulsed energy used contributes to melt through defect. Meanwhile, Ns shielding gas proved to be better shielding gas in laser welding the AZ31B. Higher angle of irradiation could reduce the underfill defect. Fillet Lap joint of similar metal was successfully done where 2.0 J of
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International Nuclear Information System (INIS)
Robinson, M.T.
1984-04-01
The ejection of atoms by the ion bombardment of solids is discussed in terms of linear collision cascade theory. A simple argument describes the energies of the ejecta, but elaborate models are required to obtain accurate sputtering yields and related quantities. These include transport theoretical models based on linearized Boltzmann equations, computer simulation models based on the binary collision approximation, and classical many-body dynamical models. The role of each kind of model is discussed. Several aspects of sputtering are illustrated by results from the simulation code MARLOWE. 20 references, 6 figures
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Study on processing parameters of glass cutting by nanosecond 532 nm fiber laser
Wang, Jin; Gao, Fan; Xiong, Baoxing; Zhang, Xiang; Yuan, Xiao
2018-03-01
The processing parameters of soda-lime glass cutting with several nanosecond 532 nm pulsed fiber laser are studied in order to obtain sufficiently large ablation rate and better processing quality. The influences of laser processing parameters on effective cutting speed and cutting quality of 1 2 mm thick soda-lime glass are studied. The experimental results show that larger laser pulse energy will lead to higher effective cutting speed and larger maximum edge collapse of the front side of the glass samples. Compared with that of 1.1 mm thick glass samples, the 2.0 mm thick glass samples is more difficult to cut. With the pulse energy of 51.2 μJ, the maximum edge collapse is more than 200 μm for the 2.0 mm thick glass samples. In order to achieve the high effective cutting speed and good cutting quality at the same time, the dual energy overlapping method is used to obtain the better cutting performance for the 2.0 mm thick glass samples, and the cutting speed of 194 mm/s and the maximum edge collapse of less than 132 μm are realized.
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Synthesis and characterization of CdTe nanostructures grown by RF magnetron sputtering method
Akbarnejad, Elaheh; Ghoranneviss, Mahmood; Hantehzadeh, Mohammad Reza
2017-08-01
In this paper, we synthesize Cadmium Telluride nanostructures by radio frequency (RF) magnetron sputtering system on soda lime glass at various thicknesses. The effect of CdTe nanostructures thickness on crystalline, optical and morphological properties has been studied by means of X-ray diffraction (XRD), UV-VIS-NIR spectrophotometry, field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM), respectively. The XRD parameters of CdTe nanostructures such as microstrain, dislocation density, and crystal size have been examined. From XRD analysis, it could be assumed that increasing deposition time caused the formation of the wurtzite hexagonal structure of the sputtered films. Optical properties of the grown nanostructures as a function of film thickness have been observed. All the films indicate more than 60% transmission over a wide range of wavelengths. The optical band gap values of the films have obtained in the range of 1.62-1.45 eV. The results indicate that an RF sputtering method succeeded in depositing of CdTe nanostructures with high purity and controllable physical properties, which is appropriate for photovoltaic and nuclear detector applications.
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Sputtering from swift-ion trails in LiF: A hybrid PIC/MD simulation
Energy Technology Data Exchange (ETDEWEB)
Cherednikov, Yaroslav; Sun, Si Neng; Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de
2013-11-15
We model the sputtering of a LiF crystal induced by swift-ion impact. The impinging ion creates a trail of doubly ionized F{sup +} ions, while simultaneously the corresponding electrons are set free. Ions move according to molecular dynamics, while excited electrons are treated by a particle-in-cell scheme. We treat the recombination time of electrons as a free parameter in our model. We find that the energy distribution of sputtered ions consists of 2 groups: a low-energy group centered at <1 eV, and a high-energy group at 7–8 eV. Fast ions (mainly Li{sup +}) are emitted early; these charge the surface negatively. Later, larger cluster ions and also neutral LiF molecules are emitted. Emission occurs at low angles to the surface normal. A jet along the normal direction can be observed, which is due to the electric field building up at the track surface. With increasing recombination time, processes are colder; sputtering decreases and the non-thermal jet structure becomes stronger.
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Variables affecting simulated Be sputtering yields
Energy Technology Data Exchange (ETDEWEB)
Björkas, C., E-mail: carolina.bjorkas@helsinki.fi; Nordlund, K.
2013-08-15
Since beryllium is a strong candidate for the main plasma-facing material in future fusion reactors, its sputtering behaviour plays an important role in predicting the reactor’s life-time. Consensus about the actual sputtering yields has not yet been achieved, as observations are influenced by experimental method and/or studied sample. In this work, the beryllium sputtering due to deuterium and beryllium self-bombardment is analyzed using molecular dynamics simulations. The main methodological aspects that influence the outcome, such as flux and fluence of the bombardment, are highlighted, and it is shown that the simulated yields also depend on the sample structure and deuterium content.
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Shayesteh Moghaddam, Narges; Saedi, Soheil; Amerinatanzi, Amirhesam; Saghaian, Ehsan; Jahadakbar, Ahmadreza; Karaca, Haluk; Elahinia, Mohammad
2018-03-01
Material and mechanical properties of NiTi shape memory alloys strongly depend on the fabrication process parameters and the resulting microstructure. In selective laser melting, the combination of parameters such as laser power, scanning speed, and hatch spacing determine the microstructural defects, grain size and texture. Therefore, processing parameters can be adjusted to tailor the microstructure and mechanical response of the alloy. In this work, NiTi samples were fabricated using Ni50.8Ti (at.%) powder via SLM PXM by Phenix/3D Systems and the effects of processing parameters were systematically studied. The relationship between the processing parameters and superelastic properties were investigated thoroughly. It will be shown that energy density is not the only parameter that governs the material response. It will be shown that hatch spacing is the dominant factor to tailor the superelastic response. It will be revealed that with the selection of right process parameters, perfect superelasticity with recoverable strains of up to 5.6% can be observed in the as-fabricated condition.
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Energy Technology Data Exchange (ETDEWEB)
Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)
2010-07-01
In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)
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Directory of Open Access Journals (Sweden)
Mahmoud Moradi
Full Text Available Abstract In the present research, the simulation of the Nickel-base superalloy Inconel 718 fiber-laser drilling process with the thickness of 1mm is investigated through the Finite Element Method. In order to specify the appropriate Gaussian distribution of laser beam, the results of an experimental research on glass laser drilling were simulated using three types of Gaussian distribution. The DFLUX subroutine was used to implement the laser heat sources of the models using the Fortran language. After the appropriate Gaussian distribution was chosen, the model was validated with the experimental results of the Nickel-base superalloy Inconel 718 laser drilling process. The negligible error percentage among the experimental and simulation results demonstrates the high accuracy of this model. The experiments were performed based on the Response Surface Methodology (RSM as a statistical design of experiment (DOE approach to investigate the influence of process parameters on the responses, obtaining the mathematical regressions and predicting the new results. Four parameters i.e. laser pulse frequency (150 to 550 Hz, laser power (200 to 500 watts, laser focal plane position (-0.5 to +0.5 mm and the duty cycle (30 to 70% were considered to be the input variables in 5 levels and four external parameters i.e. the hole's entrance and exit diameters, hole taper angle and the weight of mass removed from the hole, were observed to be the process output responses of this central composite design. By performing the statistical analysis, the input and output parameters were found to have a direct relation with each other. By an increase in each of the input variables, the entrance and exit hole diameters, the hole taper angel, and the weight of mass removed from the hole increase. Finally, the results of the conducted simulations and statistical analyses having been used, the laser drilling process was optimized by means of the desire ability approach. Good
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Mobility Optimization in LaxBa1-xSnO3 Thin Films Deposited via High Pressure Oxygen Sputtering
Postiglione, William Michael
. Specular XRD measurements confirmed highly crystalline films with narrow rocking curve FWHMs on the order of 0.05°. The optimum thickness found to maximize mobility was around 100 nm for films deposited at 8 A/min. These films exhibited room temperature mobilities in excess of 50 cm 2V-1s-1 at carrier concentrations 3 x 1020 cm-3 across 4 different substrate materials (LaAlO3, SrTiO3, GdScO3, and PrScO 3). Contrary to expectations, our findings showed no dependence of mobility on substrate mismatch, indicating that threading dislocations are either not the dominant scattering source, or that threading dislocation density in the films was constant regardless of the substrate. The highest mobility film achieved in this study, 70 cm2V -1s-1, was measured for a film grown at a considerably slower rate ( 2 A/min) and lower thickness ( 380 A). Said film was deposited on a PrScO3 (110) substrate, the most closely lattice matched substrate commercially available for BSO (-2.2% pseudo-cubic). This film showed a high out-of-plane lattice parameter from X-ray diffraction (aop = 4.158 A), suggesting a significantly strained film. This result highlights the possibility of sputtering coherent, fully strained, BSO films, far exceeding the theoretical critical thickness for misfit dislocation formation, on closely lattice matched substrates. Overall, this work validates the concept of high pressure oxygen sputtering to produce high mobility La-doped BSO films. The mobility values reported in this thesis are comparable to those found for films deposited via pulsed laser deposition in previous studies, and represent record values for sputter deposited BSO thin films.
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Negative ion production by laser ablation
Energy Technology Data Exchange (ETDEWEB)
Wada, Motoi [Doshisha Univ., Tanabe, Kyoto (Japan). Faculty of Engineering; Sasao, Mamiko
1997-02-01
The status of the development of Li{sup -} production by generating a neutral Li flux with an intense radiation of a laser beam onto the surface of Li metal has been reported. The experimental apparatus was arranged to detect a mass separated Li{sup +} and Li{sup -} ion beams. A Li sputtering probe, immersed in the extraction region of a compact (6cm diam. 7cm long) magnetic multipole ion source was irradiated with a Nd-YAG laser of 0.4 J/pulse. The production of mass-separated positive ions of Li by laser irradiation has been confirmed, but the production of Li{sup -} has not been confirmed yet due to the noise caused by a temporal discharge. (author)
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International Nuclear Information System (INIS)
Anders, Andre
2008-01-01
Self-sputtering runaway in high power impulse magnetron sputtering is closely related to the appearance of multiply charged ions. This conclusion is based on the properties of potential emission of secondary electrons and energy balance considerations. The effect is especially strong for materials whose sputtering yield is marginally greater than unity. The absolute deposition rate increases ∼Q 1/2 , whereas the rate normalized to the average power decreases ∼Q -1/2 , with Q being the mean ion charge state number
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Influence of microstructure on laser damage threshold of IBS coatings
International Nuclear Information System (INIS)
Stolz, C.J.; Genin, F.Y.; Kozlowski, M.R.; Long, D.; Lalazari, R.; Wu, Z.L.; Kuo, P.K.
1996-01-01
Ion-beam sputtering (IBS) coatings were developed for the laser gyro industry to meet significantly different requirements than those of fusion lasers. Laser gyro mirrors are small ( 26 J/cm 2 at 1,064 nm with 3-ns pulses). As part of the National Ignition Facility (NIF) coating development effort, IBS coatings are being studied to explore the possible benefits of this technology to NIF optics. As an initial step to achieving the NIF size and damage threshold requirements, the coating process is being scaled to uniformly coat a 20 x 40 cm 2 area with reduced spectral, reflected wavefront, and laser damage threshold requirements. Here, multilayer coatings deposited by ion-beam sputtering with amorphous layers were found to have lower damage thresholds at 1,064 nm than similar coatings with crystalline layers. Interestingly, at higher fluences the damage was less severe for the amorphous coatings. The magnitude of the difference in damage thresholds between the two different microstructures was strongly influenced by the size of the tested area. To better understand the microstructure effects, single layers of HfO 2 with different microstructures were studied using transmission electron microscopy, ellipsometry, and a photothermal deflection technique. Since the laser damage initiated at defects, the influence of thermal diffusivity on thermal gradients in nodular defects is also presented
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Laser ablation/ionization studies in a glow discharge
International Nuclear Information System (INIS)
Hess, K.R.; Harrison, W.W.
1985-01-01
The pin cathode glow discharge is used in the laboratory as an atomization/ionization source for a variety of applications, including solids mass spectrometry. Coupled with a tunable dye laser, the glow discharge may also serve as an atom reservoir for resonance ionization mass spectrometry in which the laser ionizes the discharge sputtered atoms. By tightly focusing the laser onto solid samples, various ablation effects may also be investigated. The laser may be used to generate an ionized plasma which may be directly analyzed by mass spectrometry. Alternatively, the ablated neutral atoms may be used in post-ablation excitation/ionization processes, in this case the glow discharge. The results of these investigations are the basis of this paper
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Process effects on radio frequency diode reactively sputtered ZrO2 films
International Nuclear Information System (INIS)
Yang, M.M.; Reith, T.M.; Lin, C.J.
1990-01-01
The ZrO 2 thin film is deposited by means of a reactive radio frequency diode sputtering from an elemental zirconium target in an argon--oxygen mixture gas. The influence of the deposition process parameters on the microinstructure, composition, film stress, and refractive index is investigated. It is noted that the process parameters, in particular substrate bias, have a profound effect on the structure and properties. The possible mechanism, in terms of bombardment of energetic particles and adatom mobility on the film surface, is discussed
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International Nuclear Information System (INIS)
Bezotosnyi, V V; Kumykov, Kh Kh
1998-01-01
A two-dimensional transient thermal model of an injection laser is developed. This model makes it possible to analyse the temperature profiles in pulsed and cw stripe lasers with an arbitrary width of the stripe contact, and also in linear laser-diode arrays. This can be done for any durations and repetition rates of the pump pulses. The model can also be applied to two-dimensional laser-diode arrays operating quasicontinuously. An analysis is reported of the influence of various structural parameters of a diode array on the thermal regime of a single laser. The temperature distributions along the cavity axis are investigated for different variants of mounting a crystal on a heat sink. It is found that the temperature drop along the cavity length in cw and quasi-cw laser diodes may exceed 20%. (lasers)
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Energy Technology Data Exchange (ETDEWEB)
Kuznetsov, A. P., E-mail: APKuznetsov@mephi.ru [National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation); Buzinskij, O. I. [State Research Center Troitsk Institute for Innovation and Fusion Research (TRINITI) (Russian Federation); Gubsky, K. L.; Nikitina, E. A.; Savchenkov, A. V.; Tarasov, B. A. [National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation); Tugarinov, S. N. [State Research Center Troitsk Institute for Innovation and Fusion Research (TRINITI) (Russian Federation)
2015-12-15
A set of optical diagnostics is expected for measuring the plasma characteristics in ITER. Optical elements located inside discharge chambers are exposed to an intense radiation load, sputtering due to collisions with energetic atoms formed in the charge transfer processes, and contamination due to recondensation of materials sputtered from different parts of the construction of the chamber. Removing the films of the sputtered materials from the mirrors with the aid of pulsed laser radiation is an efficient cleaning method enabling recovery of the optical properties of the mirrors. In this work, we studied the efficiency of removal of metal oxide films by pulsed radiation of a fiber laser. Optimization of the laser cleaning conditions was carried out on samples representing metal substrates polished with optical quality with deposition of films on them imitating the chemical composition and conditions expected in ITER. It is shown that, by a proper selection of modes of radiation exposure to the surface with a deposited film, it is feasible to restore the original high reflection characteristics of optical elements.
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International Nuclear Information System (INIS)
Kuznetsov, A. P.; Buzinskij, O. I.; Gubsky, K. L.; Nikitina, E. A.; Savchenkov, A. V.; Tarasov, B. A.; Tugarinov, S. N.
2015-01-01
A set of optical diagnostics is expected for measuring the plasma characteristics in ITER. Optical elements located inside discharge chambers are exposed to an intense radiation load, sputtering due to collisions with energetic atoms formed in the charge transfer processes, and contamination due to recondensation of materials sputtered from different parts of the construction of the chamber. Removing the films of the sputtered materials from the mirrors with the aid of pulsed laser radiation is an efficient cleaning method enabling recovery of the optical properties of the mirrors. In this work, we studied the efficiency of removal of metal oxide films by pulsed radiation of a fiber laser. Optimization of the laser cleaning conditions was carried out on samples representing metal substrates polished with optical quality with deposition of films on them imitating the chemical composition and conditions expected in ITER. It is shown that, by a proper selection of modes of radiation exposure to the surface with a deposited film, it is feasible to restore the original high reflection characteristics of optical elements
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Laser cleaning of pulsed laser deposited rhodium films for fusion diagnostic mirrors
International Nuclear Information System (INIS)
Uccello, A.; Maffini, A.; Dellasega, D.; Passoni, M.
2013-01-01
Highlights: ► Pulsed laser deposition is exploited to produce Rh films for first mirrors. ► Pulsed laser deposition is exploited to produce tokamak-like C contaminants. ► Rh laser damage threshold has been evaluated for infrared pulses. ► Laser cleaning of C contaminated Rh films gives promising results. -- Abstract: In this paper an experimental investigation on the laser cleaning process of rhodium films, potentially candidates to be used as tokamak first mirrors (FMs), from redeposited carbon contaminants is presented. A relevant issue that lowers mirror's performance during tokamak operations is the redeposition of sputtered material from the first wall on their surface. Among all the possible techniques, laser cleaning, in which a train of laser pulses is launched to the surface that has to be treated, is a method to potentially mitigate this problem. The same laser system (Q-switched Nd:YAG laser with a fundamental wavelength of 1064-nm and 7-ns pulses) has been employed with three aims: (i) production by pulsed laser deposition (PLD) of Rh film mirrors, (ii) production by PLD of C deposits with controlled morphology, and (iii) investigation of the laser cleaning method onto C contaminated Rh samples. The evaluation of Rh films laser damage threshold, as a function of fluence and number of pulses, is discussed. Then, the C/Rh films have been cleaned by the laser beam. The exposed zones have been characterized by visual inspection and scanning electron microscopy (SEM), showing promising results
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Teixidor, D.; Ferrer, I.; Ciurana, J.
2012-04-01
This paper reports the characterization of laser machining (milling) process to manufacture micro-channels in order to understand the incidence of process parameters on the final features. Selection of process operational parameters is highly critical for successful laser micromachining. A set of designed experiments is carried out in a pulsed Nd:YAG laser system using AISI H13 hardened tool steel as work material. Several micro-channels have been manufactured as micro-mold cavities varying parameters such as scanning speed (SS), pulse intensity (PI) and pulse frequency (PF). Results are obtained by evaluating the dimensions and the surface finish of the micro-channel. The dimensions and shape of the micro-channels produced with laser-micro-milling process exhibit variations. In general the use of low scanning speeds increases the quality of the feature in both surface finishing and dimensional.
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Bharatish, A.; Soundarapandian, S.
2018-04-01
Enhancing the surface functionality by ultrashort pulsed laser texturing has received the considerable attention from researchers in the past few decades. Femtosecond lasers are widely adopted since it provides high repeatability and reproducibility by minimizing the heat affected zone (HAZ) and other collateral damages to a great extent. The present paper reports some recent studies being made worldwide on femtosecond laser surface texturing of metals, ceramics, polymers, semiconductors, thinfilms and advanced nanocomposites. It presents the state of the art knowledge in femtosecond laser surface texturing and the potential of this technology to improve properties in terms of biological, tribological and wetting performance. Since the texture quality and functionality are enhanced by the proper selection of appropriate laser parameters and ambient conditions for individual application, reporting the influence of laser parameters on surface texture characteristics assume utmost importance.
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Sputtering of two-phase AgxCuγ alloys
International Nuclear Information System (INIS)
Bibic, N.; Milosavljevic, M.; Perusko, D.; Wilson, I.H.
1992-01-01
Elemental sputtering yields from two phase AgCu alloys were measured for 20, 40 and 50 at % Ag. Argon ion bombardment energies were in the range 35-55 keV and the ion dose was 1 x 10 19 ions cm -2 . The sputtering yield for silver was found to be considerably below what was expected by simple selective sputtering of a two component alloy. Analysis by electron probe X-ray microanalysis and scanning electron microscopy of the eroded surface indicated that surface diffusion of copper from copper rich grains and geometrical constraints in the dense cone forest on Cu/Ag eutectic regions combine to reduce the sputtering yield for silver. (author)
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Low-damage high-throughput grazing-angle sputter deposition on graphene
Energy Technology Data Exchange (ETDEWEB)
Chen, C.-T.; Gajek, M.; Raoux, S. [IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598 (United States); Casu, E. A. [IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598 (United States); Politecnico di Torino, Turin 10129 (Italy)
2013-07-15
Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications.
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Low-damage high-throughput grazing-angle sputter deposition on graphene
International Nuclear Information System (INIS)
Chen, C.-T.; Gajek, M.; Raoux, S.; Casu, E. A.
2013-01-01
Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications
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Low-damage high-throughput grazing-angle sputter deposition on graphene
Chen, C.-T.; Casu, E. A.; Gajek, M.; Raoux, S.
2013-07-01
Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications.
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Kim, A. A.; Klochkov, D. V.; Konyaev, M. A.; Mihaylenko, A. S.
2017-11-01
The article considers the problem of control and verification of the laser ceilometers basic performance parameters and describes an alternative method based on the use of multi-length fiber optic delay line, simulating atmospheric track. The results of the described experiment demonstrate the great potential of this method for inspection and verification procedures of laser ceilometers.
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Influence of surface topography on the sputtering yields of silver
International Nuclear Information System (INIS)
Pan Jisheng; Wang Zhenxia; Tao Zhenlan; Zhang Jiping
1992-01-01
The sputtering yields of silver have been measured as a function of the fluence of incident Ar + ions (27 keV) using the collector technique and RBS analysis. The irradiated surface was examined by scanning electron microscopy (SEM). It is shown that the sputtering yields of surfaces with topography are enhanced relative to smooth surfaces of silver, but the extent of the enhancement depends on the irradiation dose. The experimental results can be explained assuming that the surface topography and sputtering yield are a function of incident angle. It is obvious that the surface topography is an important factor to influence the sputtering yield. The term ''apparent sputtering yield'' has specifically been used when referring to the experimental sputtering yield of a surface with topography, to emphasize the difference with a smooth surface. (orig.)
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International Nuclear Information System (INIS)
Frolov, S A; Trunov, V I; Pestryakov, Efim V; Leshchenko, V E
2013-01-01
We have developed a technique for investigating the evolution of spatial inhomogeneities in high-power laser systems based on multi-stage parametric amplification. A linearised model of the inhomogeneity development is first devised for parametric amplification with the small-scale self-focusing taken into account. It is shown that the application of this model gives the results consistent (with high accuracy and in a wide range of inhomogeneity parameters) with the calculation without approximations. Using the linearised model, we have analysed the development of spatial inhomogeneities in a petawatt laser system based on multi-stage parametric amplification, developed at the Institute of Laser Physics, Siberian Branch of the Russian Academy of Sciences (ILP SB RAS). (control of laser radiation parameters)
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Wang, Jin; Wang, Hui-Ping; Wang, Xiaojie; Cui, Haichao; Lu, Fenggui
2015-03-01
This paper investigates hot cracking rate in Al fiber laser welding under various process conditions and performs corresponding process optimization. First, effects of welding process parameters such as distance between welding center line and its closest trim edge, laser power and welding speed on hot cracking rate were investigated experimentally with response surface methodology (RSM). The hot cracking rate in the paper is defined as ratio of hot cracking length over the total weld seam length. Based on the experimental results following Box-Behnken design, a prediction model for the hot cracking rate was developed using a second order polynomial function considering only two factor interaction. The initial prediction result indicated that the established model could predict the hot cracking rate adequately within the range of welding parameters being used. The model was then used to optimize welding parameters to achieve cracking-free welds.
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Gabay, S.; Lucassen, G. W.; Verkruysse, W.; van Gemert, M. J.
1997-01-01
Laser treatment of port wine stains (PWS) has become an established clinical modality over the past decade. However, in some cases full clearance of the PWS cannot be achieved. To improve the clinical results, it is necessary to match the laser treatment parameters to the PWS anatomy on an
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Third-order nonlinear optical properties of thin sputtered gold films
Xenogiannopoulou, E.; Aloukos, P.; Couris, S.; Kaminska, E.; Piotrowska, A.; Dynowska, E.
2007-07-01
Au films of thickness ranging between 5 and 52 nm were prepared by sputtering on quartz substrates and their third-order nonlinear optical response was investigated by Optical Kerr effect (OKE) and Z-scan techniques using 532 nm, 35 ps laser pulses. All prepared films were characterized by XRD, AFM and UV-VIS-NIR spectrophotometry while their third-order susceptibility χ(3) was measured and found to be of the order of 10 -9 esu. The real and imaginary parts of the third-order susceptibility were found in very good agreement with experimental results and theoretical predictions reported by Smith et al. [D.D. Smith, Y. Yoon, R.W. Boyd, Y.K. Cambell, L.A. Baker, R.M. Crooks, M. George, J. Appl. Phys. 86 (1999) 6200].
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Effects of ion sputtering on semiconductor surfaces
International Nuclear Information System (INIS)
McGuire, G.E.
1978-01-01
Ion beam sputtering has been combined with Auger spectroscopy to study the effects of ion beams on semiconductor surfaces. Observations on the mass dependence of ion selective sputtering of two component systems are presented. The effects of ion implantation are explained in terms of atomic dilution. Experimental data are presented that illustrate the super-position of selective sputtering and implantation effects on the surface composition. Sample reduction from electron and ion beam interaction is illustrated. Apparent sample changes which one might observe from the effects of residual gas contamination and electric fields are also discussed. (Auth.)
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Energy Technology Data Exchange (ETDEWEB)
Ahn, J.M.; Kim, T.H. [Dept. of Metallurgical System Engineering, YONSEI Univ., Seoul (Korea); Kim, H.Y. [Korea Environment and Merchandise Testing Inst., Seoul (Korea)
2005-07-01
The effects of following four factors, which are laser power, assist gas pressure, cooling rate and scanning speed on the quality characteristics of laser cut 316L stainless steel tubes have been studied. 2{sup 4} full factorial design and central composite design were used to evaluate optimum condition of process parameters. Regression analysis was used to develop empirical models for the combined effects of the independent process parameters on laser cut quality. As the results, it was observed that laser power, assist gas pressure and scanning speeds did the major effects on kerf width. The smallest kerf width was obtained with the condition of low laser power, assist gas pressure, scanning speed and moderate cooling rate. Calculated regression model was kerf width = 64.47 + 0.91W + 1.25P + 0.41S + 0.41C{sup 2} - 0.45P{sup 2}. (orig.)
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Tests of a new axial sputtering technique in an ECRIS
International Nuclear Information System (INIS)
Scott, R.; Pardo, R.; Vondrasek, R.
2012-01-01
Axial and radial sputtering techniques have been used over the years to create beams from an ECRIS at multiple accelerator facilities. Operational experience has shown greater beam production when using the radial sputtering method versus axial sputtering. At Argonne National Laboratory, previous work with radial sputtering has demonstrated that the position of the sputter sample relative to the plasma chamber wall influences sample drain current, beam production and charge state distribution. The possibility of the chamber wall acting as a ground plane which influences the sputtering of material has been considered, and an attempt has been made to mimic this possible ground plane effect with a coaxial sample introduced from the injection end. Results of these tests will be shown as well as comparisons of outputs using the two methods. The paper is followed by the associated poster. (authors)
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International Nuclear Information System (INIS)
Karki, Vijay; Singh, Manjeet; Sarkar, Arnab
2015-07-01
We report spectroscopic studies of laser induced plasma (LIP) produced by ns – 532 nm - Nd:YAG laser light pulses for different laser energies (35, 45 and 60 mJ) on an nuclear grade aluminum sample in air at atmospheric pressure. The temporal history of the plasma is obtained by recording the emission features at predetermined delays and at a fixed gate width (2.5 ì s). The temporal profiles of excitation temperature (T e ), ionization temperature (T ion ) and electron number density (N e ) were determined from Boltzmann plot, Saha-Boltzmann equation and Stark broadening method, respectively. T e , T ion and N e , shows a power law decay pattern with increasing acquisition time delay. T e has a positive correlation with laser energy, but the T ion and N e differ negligibly from one laser energy to another. Again the rate of decay of T e increases with increasing laser energy but that of T ion is much slower and independent of laser energy. The follow up of the local thermodynamic equilibrium (LTE) conditions were evaluated using both McWhirter criterion and T e /T ion ratio for different delays and different energies to determine the temporal range in which LTE is satisfied. Both the methods concluded very similar results except for very high energy and small delay conditions, where T e /T ion ratio deviates from unity indicating non-LTE condition. The relative transition probabilities of Al transition (3sp4s: 4 P 2/5 →3sp 2 : 4P 3/2,5/2 ) and (4s: 2 S 1/2 → 3p: 2 P 1/2,3/2 ) were estimated and are in excellent agreement with the Kurucz database. These investigations provide an insight to optimize various parameters during LIBS analysis of aluminum based matrices. (author)
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Vacuum deposition and pulsed modification of Ge thin films on Si. Structure and photoluminescence
International Nuclear Information System (INIS)
Batalov, R.I.; Bayazitov, R.M.; Novikov, G.A.; Shustov, V.A.; Bizyaev, D.A.; Gajduk, P.I.; Ivlev, G.D.; Prokop'ev, S.L.
2013-01-01
Vacuum deposition of Ge thin films onto Si substrates by magnetron sputtering was studied. During deposition sputtering time and substrate temperature were varied. Nanosecond pulsed annealing of deposited films by powerful laser or ion beams was performed. The dependence of the structure and optical properties of Ge/Si films on parameters of pulsed treatments was investigated. Optimum parameters of deposition and pulsed treatments resulting into light emitting monocrystalline Ge/Si layers are determined. (authors)
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Sputtering of nano-grains by energetic ions
Bringa, E M
2002-01-01
Sputtering from grains with a size of tens of nanometers is important in a number of astrophysical environments having a variety of plasma properties and can have applications in nano-technology. Since energy deposition by incident ions or electrons can create 'hot' regions in a small grain, thermal spike (TS) models have been applied to estimate the sputtering. The excitations produced by a fast ion are often assumed to form a 'hot' cylindrical track. In this paper we use molecular dynamics (MD) calculations to describe the energy transport and sputtering due to the creation of a 'hot' track in a grain with one quarter million atoms. We show the enhancement due to grain size and find that TS models work over a limited range of excitation densities. Discrepancies of several orders of magnitude are found when comparing our MD results for sputtering of small dust grains to those obtained by the astrophysical community using spike models.
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The Kansas State University revolving sputter source
International Nuclear Information System (INIS)
Tipping, T.N.
1989-01-01
It has been that the perfect ion source is one which runs in a very stable mode, runs continuously, and has the ability to change ion species without sacrificing the previous two requirements. This paper presents an approximation to the perfect ion source, the KSU Revolving Sputter Source. The source consists of an Aarhus-geometry sputter source with the addition of a rotating wheel which holds eight sputter cathodes. The wheel consists of a front plate with eight fixed Macor insulators and a back plate with eight Macor insulators held in place by the tension of eight springs. The cathode assembly consists of a copper cartridge with a threaded rod on one end and a sputter cathode with a threaded hole on the back. The cathode is screwed onto the cartridge and the whole assembly may be loaded into the wheel. A small spring on the side of the cartridge holds the assembly in the wheel
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Sputter deposition system for controlled fabrication of multilayers
International Nuclear Information System (INIS)
Di Nardo, R.P.; Takacs, P.Z.; Majkrzak, C.F.; Stefan, P.M.
1985-06-01
A detailed description of a sputter deposition system constructed specifically for the fabrication of x-ray and neutron multilayer monochromators and supermirrors is given. One of the principal design criteria is to maintain precise control of film thickness and uniformity over large substrate areas. Regulation of critical system parameters is fully automated so that response to feedback control information is rapid and complicated layer thickness sequences can be deposited accurately and efficiently. The use of either dc or rf magnetron sources makes it possible to satisfy the diverse material requirements of both x-ray and neutron optics
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International Nuclear Information System (INIS)
Leem, Jung Woo; Yu, Jae Su
2011-01-01
The transparent conducting oxide (TCO) films with low-refractive-index (low-n) are fabricated by the oblique-angle sputtering method. By using the experimentally measured physical data of the fabricated low-n TCO films as the simulation parameters, the effect of low-n TCOs on the performance of a-Si:H/μc-Si:H tandem thin film solar cells is investigated using Silvaco ATLAS. The Al-doped zinc oxide, indium tin oxide (ITO), and Sb-doped tin oxide films are deposited at the flux incidence angles of θ i = 0 (normal sputtering) and θ i = 80 from the sputtering target during the sputtering process. The oblique-angle sputtered films at θ i = 80 show the inclined columnar nanostructures compared to those at θ i = 0 , modifying the optical properties of the films. This is caused mainly by the increase of porosity within the film which leads to its low-n characteristics. The a-Si:H/μc-Si:H tandem thin film solar cell incorporated with the low-n ITO film exhibits an improvement in the conversion efficiency of ∝1% under AM1.5g illumination because of its higher transmittance and lower absorption compared to that with the ITO film at θ i = 0 , indicating a conversion efficiency of 13.75%. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
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Faraday screen sputtering on TPX
International Nuclear Information System (INIS)
Ehst, D.A.
1994-12-01
The TPX design stipulates that the ion-cyclotron resonance frequency (ICRF) antenna must have a Faraday screen (FS). The author considers here possible low Z coatings for the screen, as well as sputtering behavior of the Ni and Ti substrates. The theory of rf-induced sputtering has been developed, and he follows those theoretical approaches. The author's emphasis will be on both impurity generation as a possible source of increased Z eff , and also on actual erosion-lifetime of the materials under worst case conditions
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The Effect of Diode Laser With Different Parameters on Root Fracture During Irrigation Procedure.
Karataş, Ertuğrul; Arslan, Hakan; Topçuoğlu, Hüseyin Sinan; Yılmaz, Cenk Burak; Yeter, Kübra Yesildal; Ayrancı, Leyla Benan
2016-06-01
The aim of this study is to compare the effect of a single diode laser application and agitation of EDTA with diode laser with different parameters at different time intervals on root fracture. Ninety mandibular incisors were instrumented except the negative control group. The specimens were divided randomly into 10 groups according to final irrigation procedure: (G1) non-instrumented; (G2) distilled water; (G3) 15% EDTA; (G4) ultrasonically agitated EDTA; (G5) single 1.5W/100 Hz Diode laser; (G6) single 3W/100 Hz Diode laser; (G7) 1.5W/100 Hz Diode laser agitation of EDTA for 20 s; (G8) 1.5W/100 Hz Diode laser agitation of EDTA for 40 s; (G9) 3W/100 Hz Diode laser agitation of EDTA for 20 s; and (G10) 3W/100 Hz Diode laser agitation of EDTA for 40 s. The specimens were filled, mounted in acrylic resin, and compression strength test was performed on each specimen. Statistical analysis was carried out using one way ANOVA and Tukey's post hoc tests (P = 0.05). The statistical analysis revealed that there were statistically significant differences among the groups (P Laser-agitated irrigation with a 3W/100 Hz Diode laser for both 20 s and 40 s decreased the fracture resistance of teeth. Copyright © 2015 International Center for Artificial Organs and Transplantation and Wiley Periodicals, Inc.
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Pulsed dc self-sustained magnetron sputtering
International Nuclear Information System (INIS)
Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.
2008-01-01
The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition
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Directory of Open Access Journals (Sweden)
M. R. Pakmanesh
2018-03-01
Full Text Available In the present study, the optimization of pulsed Nd:YAG laser welding parameters was done on a lap-joint of a 316L stainless steel foil in order to predict the weld geometry through response surface methodology. For this purpose, the effects of laser power, pulse duration, and frequency were investigated. By presenting a second-order polynomial, the above-mentioned statistical method was managed to be well employed to evaluate the effect of welding parameters on weld width. The results showed that the weld width at the upper, middle and lower surfaces of weld cross section increases by increasing pulse durationand laser power; however, the effects of these parameters on the mentioned levels are different. The effect of pulse duration in the models of weld upper, middle and lower widths was calculated as 76, 73 and 68%, respectively. Moreover, the effect of power on theses widths was determined as 18, 24 and 28%, respectively. Finally, by superimposing these models, optimum conditions were obtained to attain a full penetration weld and the weld with no defects.
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Sputtering and mixing of supported nanoparticles
International Nuclear Information System (INIS)
Jiménez-Sáez, J.C.; Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J.
2013-01-01
Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed
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International Nuclear Information System (INIS)
Hellermann, M. von; Hirsch, K.; Doeble, H.F.
1977-04-01
The possibilities to use periodically pulsed lasers for plasma scattering diagnostics are discussed. An experiment with succesful application of a periodically pulsed frequency-doubled Nd:YAG laser is described and results are given. Application of the method to monitor continuously, with millisecond time resolution, parameters of Tokamak type plasmas, is considered. (orig.) [de
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International Nuclear Information System (INIS)
Ruffino, F.; Pugliara, A.; Carria, E.; Romano, L.; Bongiorno, C.; Fisicaro, G.; La Magna, A.; Spinella, C.; Grimaldi, M.G.
2012-01-01
Highlights: ► Au nanoclusters are produced by nanosecond laser irradiations of thin Au film on Si. ► The shape, size, and surface density of the Au nanoclusters are tunable by laser fluence. ► The formation dynamic of the Au nanoclusters under nanosecond laser irradiation is analyzed. - Abstract: In this work, we study the nanostructuring effects of nanosecond laser irradiations on 5 nm thick Au film sputter-deposited on Si. After deposition of Au on Si substrate, nanosecond laser irradiations were performed increasing the laser fluence from 750 to 1500 mJ/cm 2 . Several analyses techniques, such as Rutherford backscattering spectrometry, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy were crossed to study the morphological evolution of the Au film as a function of laser fluence. In particular, the formation of Au nanoparticles was observed. The analyses allowed a quantitative evaluation of the evolution of the nanoparticles size, surface density, and shape as a function of the laser fluence. Therefore, a control the structural properties of the Au nanoparticles is reached, for example, for applications in Si nanowires growth or plasmonics.
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Tuning silver ion release properties in reactively sputtered Ag/TiOx nanocomposites
Xiong, J.; Ghori, M. Z.; Henkel, B.; Strunskus, T.; Schürmann, U.; Deng, M.; Kienle, L.; Faupel, F.
2017-07-01
Silver/titania nanocomposites with strong bactericidal effects and good biocompatibility/environmental safety show a high potential for antibacterial applications. Tailoring the silver ion release is thus highly promising to optimize the antibacterial properties of such coatings and to preserve biocompatibility. Reactive sputtering is a fast and versatile method for the preparation of such Ag/TiOx nanocomposites coatings. The present work is concerned with the influence of sputter parameters on the surface morphology and silver ion release properties of reactively sputtered Ag/TiOx nanocomposites coatings showing a silver nanoparticle size distribution in the range from 1 to 20 nm. It is shown that the silver ion release rate strongly depends on the total pressure: the coatings prepared at lower pressure present a lower but long-lasting release behavior. The much denser structure produced under these conditions reduces the transport of water molecules into the coating. In addition, the influence of microstructure and thickness of titanium oxide barriers on the silver ion release were investigated intensively. Moreover, for the coatings prepared at high total pressure, it was demonstrated that stable and long-lasting silver release can be achieved by depositing a barrier with a high rate. Nanocomposites produced under these conditions show well controllable silver ion release properties for applications as antibacterial coatings.
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Far-and mid-infrared properties of carbon layers elaborated by plasma sputtering
Energy Technology Data Exchange (ETDEWEB)
Rousseau, Benoit, E-mail: benoit.rousseau@univ-nantes.fr [Université de Nantes, CNRS, LTN UMR6607, La Chantrerie, Rue Christian Pauc, B.P. 50609, F-44306 Nantes Cedex 3 (France); Ammar, Mohamed Ramzi; Bormann, Denis; Simon, Patrick [CNRS, CEMHTI UPR3079, Université d' Orléans, F-55071 (France); Rabat, Hervé; Brault, Pascal [Université d' Orléans, CNRS, GREMI UMR7344, BP 6744, F-45067 Orléans Cedex 2 (France)
2016-12-30
Highlights: • Magnetron sputtering deposition of columnar, disordered carbon films. • Sputtered carbon films infrared properties are dependent on the local order. • Film texture at the micro-nanoscale explains difference of optical properties. - Abstract: The far-and mid-infrared reflectivity spectra of two carbon layers deposited on pure (100) silicon substrates by DC magnetron sputtering were investigated at room temperature in the 10–5000 cm{sup −1} wavenumber range. Their structural and textural features were also studied by combining Raman spectroscopy, Field Emission Scanning Electron Microscopy (FESEM), High Resolution Transmission Electron Microscopy (HRTEM), X-Ray Reflectivity (XRR) and Rutherford Backscattering Spectroscopy (RBS). The set of results was used to discuss afterwards the influence of the texture on the infrared properties at varying length scale. Thereby, the two layers were found to be heterogeneous as assessed by RBS, XRR and FESEM and their thicknesses had been measured by XRR and FESEM. The information on the structural organization and “crystallite” size was given by Raman spectroscopy. The influence of both the textural and structural parameters on the measured infrared reflectivity spectra was discussed. Finally, a methodology was proposed to recover the intrinsic index of refraction and the intrinsic index of absorption of each layer.
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Analysis and optimization of machining parameters of laser cutting for polypropylene composite
Deepa, A.; Padmanabhan, K.; Kuppan, P.
2017-11-01
Present works explains about machining of self-reinforced Polypropylene composite fabricated using hot compaction method. The objective of the experiment is to find optimum machining parameters for Polypropylene (PP). Laser power and Machining speed were the parameters considered in response to tensile test and Flexure test. Taguchi method is used for experimentation. Grey Relational Analysis (GRA) is used for multiple process parameter optimization. ANOVA (Analysis of Variance) is used to find impact for process parameter. Polypropylene has got the great application in various fields like, it is used in the form of foam in model aircraft and other radio-controlled vehicles, thin sheets (∼2-20μm) used as a dielectric, PP is also used in piping system, it is also been used in hernia and pelvic organ repair or protect new herrnis in the same location.
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The selection of Lorenz laser parameters for transmission in the SMF 3rd transmission window
Gajda, Jerzy K.; Niesterowicz, Andrzej; Zeglinski, Grzegorz
2003-10-01
The work presents simulation of transmission line results with the fiber standard ITU-T G.652. The parameters of Lorenz laser decide about electrical signal parameters like eye pattern, jitter, BER, S/N, Q-factor, scattering diagram. For a short line lasers with linewidth larger than 100MHz can be used. In the paper cases for 10 Gbit/s and 40 Gbit/s transmission and the fiber length 30km, 50km, and 70km are calculated. The average open eye patterns were 1*10-5-120*10-5. The Q factor was 10-23dB. In calcuations the bit error rate (BER) was 10-40-10-4. If the bandwidth of Lorenz laser increases from 10 MHz to 500MHz a distance of transmission decrease from 70km to 30km. Very important for transmission distance is a rate bit of transmitter. If a bit rate increase from 10Gbit/s to 40 Gbit/s, the transmission distance for the signal mode fiber G.652 will decrease from 70km to 5km.
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Qian, Liang; Zeng, Li; Wei, Bin; Gong, Yao
2015-06-01
To fabricate selective laser melting cobalt-chromium alloy samples by different processing parameters, and to analyze the changes of energy dispersive spectrum(EDS) on their surface. Nine groups were set up by orthogonal experimental design according to different laser powers,scanning speeds and powder feeding rates(laser power:2500-3000 W, scanning speed: 5-15 mm/s, powder feeding rate: 3-6 r/min). Three cylinder specimens(10 mm in diameter and 3 mm in thickness) were fabricated in each group through Rofin DL 035Q laser cladding system using cobalt-chromium alloy powders which were developed independently by our group.Their surface compositions were then measured by EDS analysis. Results of EDS analysis of the 9 groups fabricated by different processing parameters(Co:62.98%-67.13%,Cr:25.56%-28.50%,Si:0.49%-1.23%) were obtained. They were similar to the compositions of cobalt-chromium alloy used in dental practice. According to EDS results, the surface compositions of the selective laser melting cobalt-chromium alloy samples are stable and controllable, which help us gain a preliminary sight into the range of SLM processing parameters. Supported by "973" Program (2012CB910401) and Research Fund of Science and Technology Committee of Shanghai Municipality (12441903001 and 13140902701).
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Development of a hybrid sputtering/evaporation process for Cu(In,Ga)Se{sub 2} thin film solar cells
Energy Technology Data Exchange (ETDEWEB)
Acciarri, M.; Binetti, S.; Le Donne, A.; Lorenzi, B.; Caccamo, L.; Miglio, L. [Dipartimento di Scienza dei Materiali e Solar Energy Research Center MIB-SOLAR, Universita di Milano Bicocca, Milan (Italy); Moneta, R.; Marchionna, S.; Meschia, M. [Voltasolar s.r.l, Turate (Italy)
2011-08-15
In this paper we report a new method for Cu(In,Ga)Se{sub 2} deposition for solar cell application. Differently from the common co-evaporation process, an alterative approach for thin film Cu(In,Ga)Se{sub 2} has been tested: the sputtering deposition of metal elements combined with the selenium evaporation. We have studied the relationships between the growth parameters of our hybrid sputtering/evaporation method and the chemical-physical properties of the CIGS films. The cells are completed with a CdS buffer layer deposited by chemical bath deposition and ZnO + ITO deposited by RF sputtering. Test solar cells of 0.5 cm{sup 2} have shown an efficiency of 10% and 2.5% on glass and stainless steel substrate respectively. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
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Simulation of carbon sputtering due to molecular hydrogen impact
International Nuclear Information System (INIS)
Laszlo, J.
1993-01-01
Simulated results are compared to experimental data on the sputtering yield of carbon due to atomic and to molecular hydrogen impact. The experimental sputtering yields of carbon (graphite) due to low energy hydrogen bombardment have been found to be higher than the simulated ones. Efforts are made to obtain high enough simulated yields by considering the formation of dimer, H 2 and D 2 molecules in the primary beam. The molecular beam model applies full neutralization and full dissociation at the surface. The simulation of sputtering yields of target materials up to Z 2 ≤ 30 is also included for the low primary energy regime for deuterium projectiles. It is found that, although the sputtering yields really tend to increase, the effect of molecule formation in the beam in itself cannot be made responsible for the deviation between measured and simulated sputtering yields. (orig.)
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International Nuclear Information System (INIS)
Unal, Bayram; Tai, C.-Y.; Shepherd, David P.; Wilkinson, James S.; Perney, Nicolas M.B.; Netti, M. Caterina; Parker, Gregory J.
2005-01-01
Ta 2 O 5 waveguides offer great potential for high-density active photonic crystal circuits and their combination with rare-earth dopants for active devices is of interest for increasing their potential functionality. To this end, neodymium-doped Ta 2 O 5 rib waveguide lasers have been fabricated on an oxidized silicon wafer by rf sputtering and argon ion-beam milling and laser action in this material has been demonstrated. Lasing was observed at wavelenghts between 1060 and 1080 nm and an absorbed pump power threshold of 87 mW was obtained
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Energy Technology Data Exchange (ETDEWEB)
Gaouyat, Lucie, E-mail: lucie.gaouyat@fundp.ac.be [Solid State Physics Laboratory, Research Center in Physics of Matter and Radiation (PMR), Facultés Universitaires Notre-Dame de la Paix (FUNDP), 61 rue de Bruxelles, B-5000 Namur (Belgium); Mirabella, Frédéric [CRM Group – AC and CS, 57b boulevard de Colonster, B-4000 Liège (Belgium); Deparis, Olivier [Solid State Physics Laboratory, Research Center in Physics of Matter and Radiation (PMR), Facultés Universitaires Notre-Dame de la Paix (FUNDP), 61 rue de Bruxelles, B-5000 Namur (Belgium)
2013-04-15
NiCrO{sub x} ceramic–metal composites (i.e. cermets) exhibit not only oxidation and moisture resistances, which are very important for industrial applications, but also remarkable solar selective absorption properties. In order to reach the best optical performances with only one coating layer, tuning of the magnetron sputtering process parameters (O{sub 2} flow rate, pressure and deposition time) was performed systematically. The process window turned out to be very narrow implying a critical tuning of the parameters. The optimal operating point was determined for a single layer coating of NiCrO{sub x} on an aluminium substrate, leading to a spectrally integrated solar absorption as high as 78%. Among various material properties, the focus was put on the optical reflectance of the coating/substrate system, which was measured by UV–vis–NIR spectrophotometry. Using complex refractive index data from the literature, the theoretical reflectance spectra were calculated and found to be in good agreement with the measurements. Chemical analysis combined with scanning electronic and atomic force microscopies suggested a cermet structure consisting of metallic Ni particles and a compound matrix made of a mixture of chromium oxide, nickel oxide and nickel hydroxide.
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International Nuclear Information System (INIS)
Zhang, Baicheng; Dembinski, Lucas; Coddet, Christian
2013-01-01
In this work, a systematic analysis of the main parameters for the selective laser melting (SLM) of a commercial stainless steel 316L powder was conducted to improve the mechanical properties and dimensional accuracy of the fabricated parts. First, the effects of the processing parameters, such as the laser beam scanning velocity, laser power, substrate condition and thickness of the powder layer, on the formation of single tracks for achieving a continuous melting and densification of the material were analysed. Then, the influence of the environmental conditions (gas nature) and of the preheating temperature on the density and dimensional accuracy of the parts was considered. The microstructural features of the SLM SS 316L parts were carefully observed to elucidate the melting-solidification mechanism and the thermal history, which are the basis of the manufacturing process. Finally, the mechanical properties of the corresponding material were also determined
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Modeling Solar-Wind Heavy-Ions' Potential Sputtering of Lunar KREEP Surface
Barghouty, A. F.; Meyer, F. W.; Harris, R. P.; Adams, J. H., Jr.
2012-01-01
Recent laboratory data suggest that potential sputtering may be an important weathering mechanism that can affect the composition of both the lunar surface and its tenuous exosphere; its role and implications, however, remain unclear. Using a relatively simple kinetic model, we will demonstrate that solar-wind heavy ions induced sputtering of KREEP surfaces is critical in establishing the timescale of the overall solar-wind sputtering process of the lunar surface. We will also also show that potential sputtering leads to a more pronounced and significant differentiation between depleted and enriched surface elements. We briefly discuss the impacts of enhanced sputtering on the composition of the regolith and the exosphere, as well as of solar-wind sputtering as a source of hydrogen and water on the moon.
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International Nuclear Information System (INIS)
Tarkovsky, V V; Kurstak, V Yu; Anufrik, S S
2003-01-01
The anomalous dependence of the lasing parameters of ethanol solutions of coumarin, rhodamine, oxazine, and laser dyes of other classes on the spectrum of microsecond pump laser pulses is found. The dependence is determined by the shape of the induced singlet - singlet absorption spectra and absorption spectra of short-lived photoproducts. The elucidation of the influence of these factors makes it possible to choose optimal pump spectra and to enhance the efficiency and stability of microsecond dye lasers. (active media)
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Effect of Wall Material on H– Production in a Plasma Sputter-Type Ion Source
Directory of Open Access Journals (Sweden)
Y. D. M. Ponce
2004-12-01
Full Text Available The effect of wall material on negative hydrogen ion (H– production was investigated in a multicusp plasma sputter-type ion source (PSTIS. Steady-state cesium-seeded hydrogen plasma was generated by a tungsten filament, while H– was produced through surface production using a molybdenum sputter target. Plasma parameters and H– yields were determined from Langmuir probe and Faraday cup measurements, respectively. At an input hydrogen pressure of 1.2 mTorr and optimum plasma discharge parameters Vd = –90 V and Id = –2.25 A, the plasma parameters ne was highest and T–e was lowest as determined from Langmuir probe measurements. At these conditions, aluminum generates the highest ion current density of 0.01697 mA/cm2, which is 64% more than the 0.01085 mA/cm2 that stainless steel produces. The yield of copper, meanwhile, falls between the two materials at 0.01164 mA/cm2. The beam is maximum at Vt = –125 V. Focusing is achieved at VL = –70 V for stainless steel, Vt = –60 V for aluminum, and Vt = –50 V for copper. The results demonstrate that proper selection of wall material can greatly enhance the H– production of the PSTIS.
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Energy Technology Data Exchange (ETDEWEB)
Gnehr, W.M.
2006-06-15
The thesis deals with a reactive sputter process for the deposition of ITO- films. In contrast to the usual technique, the sputter targets consists of indium-tin-alloy instead of ceramic ITO. All experiments were conducted on an inline coater with 600 mm target-width. The process is stabilized by a control loop based on optical emission detection. The experiments prove, that this control loop guarantees a long term stability of the outcomes of the coating process.Process parameters, that are crucial for the optical and electrical properties of the deposited thin films are identified and studied. Among them are the flow of oxygen and the substrate temperature but also less obvious parameters such as the distance between target and substrate.Througout the work the focus is on the film deposition with pulsed plasmas. Novel bipolar DC pulse- and pulse package generators are employed for the deposition.In order to shed some light onto the influence of certain pulse parameters on the outcome of a particular coating process, a Monte-Carlo-Simulation of the particle flow in pulsed plasmas is developed. This simulation yields the distribution of particles and their respective energies on deliberately placed planes in the process chamber. Particles under investigation are both sputtered species and neutral sputter gas atoms reflected at the target. The results of this simulation provide an explanation for the influence of certain pulse parameters on the outcome of the coating process. The further investigations deal with the influence of the construction of the process chamber on the coating process. For this purpose, locally resolved optical spectra are recorded. In order to analyse these spectra, a novel connected fit algorithm is developed.This algorithm yields the distribution of certain fitparameters on the substrate. Provided the most complex of the discussed parametrizations of the dielectric function are used, these can be crucial properties such as the carrier
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Modelling of low energy ion sputtering from oxide surfaces
International Nuclear Information System (INIS)
Kubart, T; Nyberg, T; Berg, S
2010-01-01
The main aim of this work is to present a way to estimate the values of surface binding energy for oxides. This is done by fitting results from the binary collisions approximation code Tridyn with data from the reactive sputtering processing curves, as well as the elemental composition obtained from x-ray photoelectron spectroscopy (XPS). Oxide targets of Al, Ti, V, Nb and Ta are studied. The obtained surface binding energies are then used to predict the partial sputtering yields. Anomalously high sputtering yield is observed for the TiO 2 target. This is attributed to the high sputtering yield of Ti lower oxides. Such an effect is not observed for the other studied metals. XPS measurement of the oxide targets confirms the formation of suboxides during ion bombardment as well as an oxygen deficient surface in the steady state. These effects are confirmed from the processing curves from the oxide targets showing an elevated sputtering rate in pure argon.
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Directory of Open Access Journals (Sweden)
Mária Behúlová
2017-01-01
Full Text Available Joining of dissimilar Al-Ti alloys is very interesting from the point of view of weight reduction of components and structures in automotive or aerospace industries. In the dependence on cooling rate and chemical composition, rapid solidification of Al-Ti alloys during laser welding can lead to the formation of metastable phases and brittle intermetallic compounds that generally reduce the quality of produced weld joints. The paper deals with design and testing of welding parameters for preparation of weld joints of two sheets with different thicknesses from titanium Grade 2 and AW 5754 aluminium alloy. Temperature fields developed during the formation of Al-Ti butt joints were investigated by numerical simulation in ANSYS software. The influence of laser welding parameters including the laser power and laser beam offset on the temperature distribution and weld joint formation was studied. The results of numerical simulation were verified by experimental temperature measurement during laser beam welding applying the TruDisk 4002 disk laser. The microstructure of produced weld joints was assessed by light microscopy and scanning electron microscopy. EDX analysis was applied to determine the change in chemical composition across weld joints. Mechanical properties of weld joints were evaluated using tensile tests and Vickers microhardness measurements.
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International Nuclear Information System (INIS)
Chadderton, L.T.
1977-01-01
It is widely believed that the phenomenon responsible for the familiar peak in the angular dependence of sputtered yields also gives rise to characteristic semiangles α of conical protruberances on sputtered surfaces. It is shown that α corresponds to the process giving rise to the minimum rather than the maximum. No accurate measurements of the minimum have yet been made. (Auth.)
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Thin films preparation of the Ti-Al-O system by rf-sputtering
International Nuclear Information System (INIS)
Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J.; Manaud, J. P.; Lahaye, M.; Munoz S, J.
2010-01-01
In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti 3 Al targets in a sputtering chamber with an Ar-O 2 atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)
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RF sputtering: A viable tool for MEMS fabrication
Indian Academy of Sciences (India)
being prepared by RF sputtering and their application in MEMS being explored. ... crystallographic properties were evaluated using XRD analysis (CuKα radiation ..... Bhatt V, Pal P, Chandra S 2005 Feasibility study of RF sputtered ZnO film for ...
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International Nuclear Information System (INIS)
Ershov-Pavlov, E.A.; Katsalap, K.Yu.; Stepanov, K.L.; Stankevich, Yu.A.
2008-01-01
A physical model is developed accounting for dynamics and radiation of plasma plumes induced by nanosecond laser pulses on surface of solid samples. The model has been applied to simulate emission spectra of the laser erosion plasma at the elemental analysis of metals using single- and double-pulse excitation modes. Dynamics of the sample heating and expansion of the erosion products are accounted for by the thermal conductivity and gas dynamic equations, respectively, supposing axial symmetry. Using the resulting time-space distributions of the plasma parameters, emission spectra of the laser plumes are evaluated by solving the radiation transfer equation. Particle concentration in consecutive ionization stages is described by the Saha equation in the Debye approximation. The population of excited levels is determined according to Boltzmann distribution. Local characteristics determining spectral emission and absorption coefficients are obtained point-by-point along an observation line. Voigt spectral line profiles are considered with main broadening mechanisms taken into account. The plasma dynamics and plume emission spectra have been studied experimentally and by the model. A Q-switched Nd:YAG laser at 1064 nm wavelength has been used to irradiate Al sample with the pulses of 15 ns and 50 mJ duration and energy, respectively. It has resulted in maximum power density of 0.8 MW/cm 2 on the sample surface. The laser plume emission spectra have been recorded at a side-on observation. Problems of the spectra contrast and of the elemental analysis efficiency are considered relying on a comparative study of the measurement and simulation results at the both excitation modes
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Sputtering mechanisms of polycrystalline platinum by low energy ions
International Nuclear Information System (INIS)
Chernysh, V.S.; Eckstein, W.; Haidarov, A.A.; Kulikauskas, V.S.; Mashkova, E.S.; Molchanov, V.A.
1999-01-01
The results of an experimental study and a computer simulation with the TRIM.SP code of the angular distributions of atoms sputtered from polycrystalline platinum under 1.5-9 keV He + bombardment at the normal ion incidence are presented. It has been found that angular distributions of sputtered atoms are overcosine and that their shape is practically independent of the bombarding ion species and ion energy. Good agreement between experimental results and computer simulation data was found. Computer simulations of the partial angular distributions of Pt atoms ejected due to various sputtering mechanisms for He and Ar bombardments were performed. The role of different mechanisms in the formation of angular distributions of sputtered atoms has been analyzed
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Rosa, Benoit; Brient, Antoine; Samper, Serge; Hascoët, Jean-Yves
2016-12-01
Mastering the additive laser manufacturing surface is a real challenge and would allow functional surfaces to be obtained without finishing. Direct Metal Deposition (DMD) surfaces are composed by directional and chaotic textures that are directly linked to the process principles. The aim of this work is to obtain surface topographies by mastering the operating process parameters. Based on experimental investigation, the influence of operating parameters on the surface finish has been modeled. Topography parameters and multi-scale analysis have been used in order to characterize the DMD obtained surfaces. This study also proposes a methodology to characterize DMD chaotic texture through topography filtering and 3D image treatment. In parallel, a new parameter is proposed: density of particles (D p). Finally, this study proposes a regression modeling between process parameters and density of particles parameter.
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Valkunde, Amol T.; Patil, Sandip D.; Vhanmore, Bandopant D.; Urunkar, Trupti U.; Gavade, Kusum M.; Takale, Mansing V.; Fulari, Vijay J.
2018-03-01
In the present paper, an analytically investigated domain of decentered parameter and its effect on the self-focusing of Hermit-cosh-Gaussian (HChG) laser beams in a collisional plasma have been studied theoretically. The nonlinearity in the dielectric constant of plasma arising due to the nonuniform heating of carriers along the wavefront of the laser beam has been employed in the present investigation. The nonlinear differential equation of beam width parameter for various laser modes of HChG beam is obtained by following the standard Akhamanov's parabolic equation approach under Wentzel-Kramers-Brillouin and paraxial approximations. The analytical treatment has enabled us to define three distinct regions: self-focusing, self-trapping and defocusing, which are presented graphically.
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Sproul, William D.; Rudnik, Paul J.; Graham, Michael E.; Rohde, Suzanne L.
1990-01-01
Attention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.
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International Nuclear Information System (INIS)
Bolshov, Mikhail A; Kuritsyn, Yu A; Liger, V V; Mironenko, V R; Leonov, S B; Yarantsev, D A
2009-01-01
We report a procedure for temperature and water vapour concentration measurements in an unsteady-state combustion zone using diode laser absorption spectroscopy. The procedure involves measurements of the absorption spectrum of water molecules around 1.39 μm. It has been used to determine hydrogen combustion parameters in M = 2 gas flows in the test section of a supersonic wind tunnel. The relatively high intensities of the absorption lines used have enabled direct absorption measurements. We describe a differential technique for measurements of transient absorption spectra, the procedure we used for primary data processing and approaches for determining the gas temperature and H 2 O concentration in the probed zone. The measured absorption spectra are fitted with spectra simulated using parameters from spectroscopic databases. The combustion-time-averaged (∼50 ms) gas temperature and water vapour partial pressure in the hot wake region are determined to be 1050 K and 21 Torr, respectively. The large signal-to-noise ratio in our measurements allowed us to assess the temporal behaviour of these parameters. The accuracy in our temperature measurements in the probed zone is ∼40 K. (laser applications and other topics in quantum electronics)
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Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics
Energy Technology Data Exchange (ETDEWEB)
Anders, Andre
2009-11-22
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.
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Deposition rates of high power impulse magnetron sputtering: Physics and economics
International Nuclear Information System (INIS)
Anders, Andre
2010-01-01
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.
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Energy Technology Data Exchange (ETDEWEB)
Leem, Jung Woo; Yu, Jae Su [Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of)
2011-09-15
The transparent conducting oxide (TCO) films with low-refractive-index (low-n) are fabricated by the oblique-angle sputtering method. By using the experimentally measured physical data of the fabricated low-n TCO films as the simulation parameters, the effect of low-n TCOs on the performance of a-Si:H/{mu}c-Si:H tandem thin film solar cells is investigated using Silvaco ATLAS. The Al-doped zinc oxide, indium tin oxide (ITO), and Sb-doped tin oxide films are deposited at the flux incidence angles of {theta}{sub i} = 0 (normal sputtering) and {theta}{sub i} = 80 from the sputtering target during the sputtering process. The oblique-angle sputtered films at {theta}{sub i} = 80 show the inclined columnar nanostructures compared to those at {theta}{sub i} = 0 , modifying the optical properties of the films. This is caused mainly by the increase of porosity within the film which leads to its low-n characteristics. The a-Si:H/{mu}c-Si:H tandem thin film solar cell incorporated with the low-n ITO film exhibits an improvement in the conversion efficiency of {proportional_to}1% under AM1.5g illumination because of its higher transmittance and lower absorption compared to that with the ITO film at {theta}{sub i} = 0 , indicating a conversion efficiency of 13.75%. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
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International Nuclear Information System (INIS)
Wu Sujuan; Han Hongwei; Tai Qidong; Zhang Jing; Xu Sheng; Zhou Conghua; Yang Ying; Hu Hao; Chen Bolei; Sebo, Bobby; Zhao Xingzhong
2008-01-01
A surface modification method was carried out by reactive DC magnetron sputtering to fabricate TiO 2 electrodes coated with insulating MgO for dye-sensitized solar cells. The MgO-coated TiO 2 electrode had been characterized by x-ray photoelectron spectroscopy (XPS), energy-dispersive x-ray spectroscopy (EDX), scanning electron microscopy (SEM), UV-vis spectrophotometer, cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The study results revealed that the TiO 2 modification increases dye adsorption, decreases trap states and suppresses interfacial recombination. The effects of sputtering MgO for different times on the performance of DSSCs were investigated. It indicated that sputtering MgO for 3 min on TiO 2 increases all cell parameters, resulting in increasing efficiency from 6.45% to 7.57%
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Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials
Barghouty, Abdulmasser F.; Adams, James H., Jr.
2008-01-01
At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.
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International Nuclear Information System (INIS)
Silvia, Devin W.; Smith, Britton D.; Michael Shull, J.
2010-01-01
We investigate through hydrodynamic simulations the destruction of newly formed dust grains by sputtering in the reverse shocks of supernova (SN) remnants. Using an idealized setup of a planar shock impacting a dense, spherical clump, we implant a population of Lagrangian particles into the clump to represent a distribution of dust grains in size and composition. We then post-process the simulation output to calculate the grain sputtering for a variety of species and size distributions. We explore the parameter space appropriate for this problem by altering the overdensity of the ejecta clumps and the speed of the reverse shocks. Since radiative cooling could lower the temperature of the medium in which the dust is embedded and potentially protect the dust by slowing or halting grain sputtering, we study the effects of different cooling methods over the timescale of the simulations. In general, our results indicate that grains with radii less than 0.1 μm are sputtered to much smaller radii and often destroyed completely, while larger grains survive their interaction with the reverse shock. We also find that, for high ejecta densities, the percentage of dust that survives is strongly dependent on the relative velocity between the clump and the reverse shock, causing up to 50% more destruction for the highest velocity shocks. The fraction of dust destroyed varies widely across grain species, ranging from total destruction of Al 2 O 3 grains to minimal destruction of Fe grains (only 20% destruction in the most extreme cases). C and SiO 2 grains show moderate to strong sputtering as well, with 38% and 80% mass loss. The survival rate of grains formed by early SNe is crucial in determining whether or not they can act as the 'dust factories' needed to explain high-redshift dust.
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Investigation of ion sputtering for eutectic Cu-37 at% Ag alloys
International Nuclear Information System (INIS)
Wang Zhenxia; Pan Jisheng; Zhang Jiping; Tao Zhenlan; Zhu Fuying; Zhao Lie; Zhang Huiming
1994-01-01
Angular distributions of sputtered atoms and the phenomenon of element locally rich relative to micro-topographic feature (ELR-MTF) of sputtered target surface have been investigated for Cu-37 at% Ag alloys by means of RBS, SEM and EPMA measurements. In the paper,emphasis will be put on the correlation between surface topography caused by Ar + ion bombardment with different doses and angular distribution of sputtered atoms ejecting from various micro-zones at topographical surface during sputtering. The experiment result was explained with the so-called ELR-MTF model which can qualitatively interpret the shape of the angular distributions and the variation of the preferential sputtering curves
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Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging
Energy Technology Data Exchange (ETDEWEB)
Ziani, A. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Centre National d’Etudes Spatiales (CNES), 18 Avenue E. Belin, 31401 Toulouse (France); Delmotte, F., E-mail: Franck.Delmotte@InstitutOptique.fr [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Le Paven-Thivet, C. [Institut d' Electronique et de Télécommunications de Rennes (IETR) UMR-CNRS 6164, Université de Rennes 1, UEB, IUT Saint Brieuc, 18 rue Henri Wallon, 22004 Saint Brieuc cedex France (France); Meltchakov, E.; Jérome, A. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Roulliay, M. [Institut des Sciences Moléculaires d’Orsay UMR 8214, Univ Paris Sud, 91405 Orsay France (France); Bridou, F. [Laboratoire Charles Fabry, Institut d' Optique, CNRS, Univ Paris Sud, 2 Avenue Augustin Fresnel, 91127 Palaiseau cedex France (France); Gasc, K. [Centre National d’Etudes Spatiales (CNES), 18 Avenue E. Belin, 31401 Toulouse (France)
2014-02-03
In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17 nm–34 nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The purpose of this study consists in optimizing the deposition of Al-based multilayers by ion beam sputtering according to several parameters such as the ion beam current and the sputtering angle. After optimization of Al thin films, several kinds of Al-based multilayer mirrors have been compared. We have deposited and characterized bi-material and also tri-material periodic multilayers: aluminum/molybdenum [Al/Mo], aluminum/molybdenum/boron carbide [Al/Mo/B{sub 4}C] and aluminum/molybdenum/silicon carbide [Al/Mo/SiC]. Best experimental results have been obtained on Al/Mo/SiC samples: we have measured reflectivity up to 48% at 17.3 nm and 27.5% at 28.2 nm on a synchrotron radiation source. - Highlights: • Design and synthesis of extreme ultraviolet interferential mirrors. • Optimization of aluminum thin films by adjusting several deposition parameters. • Comparison of results obtained with different types of Al-based multilayer mirrors. • Reflectivity up to 48% at 17.3 nm on a synchrotron radiation source.
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Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging
International Nuclear Information System (INIS)
Ziani, A.; Delmotte, F.; Le Paven-Thivet, C.; Meltchakov, E.; Jérome, A.; Roulliay, M.; Bridou, F.; Gasc, K.
2014-01-01
In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17 nm–34 nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The purpose of this study consists in optimizing the deposition of Al-based multilayers by ion beam sputtering according to several parameters such as the ion beam current and the sputtering angle. After optimization of Al thin films, several kinds of Al-based multilayer mirrors have been compared. We have deposited and characterized bi-material and also tri-material periodic multilayers: aluminum/molybdenum [Al/Mo], aluminum/molybdenum/boron carbide [Al/Mo/B 4 C] and aluminum/molybdenum/silicon carbide [Al/Mo/SiC]. Best experimental results have been obtained on Al/Mo/SiC samples: we have measured reflectivity up to 48% at 17.3 nm and 27.5% at 28.2 nm on a synchrotron radiation source. - Highlights: • Design and synthesis of extreme ultraviolet interferential mirrors. • Optimization of aluminum thin films by adjusting several deposition parameters. • Comparison of results obtained with different types of Al-based multilayer mirrors. • Reflectivity up to 48% at 17.3 nm on a synchrotron radiation source
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Huang, Wei; Tan, Rongqing; Li, Zhiyong; Han, Gaoce; Li, Hui
2017-03-01
A theoretical model based on common pump structure is proposed to analyze the output characteristics of a diode-pumped alkali vapor laser (DPAL) and XPAL (exciplex-pumped alkali laser). Cs-DPAL and Cs-Ar XPAL systems are used as examples. The model predicts that an optical-to-optical efficiency approaching 80% can be achieved for continuous-wave four- and five-level XPAL systems with broadband pumping, which is several times the pumped linewidth for DPAL. Operation parameters including pumped intensity, temperature, cell's length, mixed gas concentration, pumped linewidth, and output coupler are analyzed for DPAL and XPAL systems based on the kinetic model. In addition, the predictions of selection principal of temperature and cell's length are also presented. The concept of the equivalent "alkali areal density" is proposed. The result shows that the output characteristics with the same alkali areal density but different temperatures turn out to be equal for either the DPAL or the XPAL system. It is the areal density that reflects the potential of DPAL or XPAL systems directly. A more detailed analysis of similar influences of cavity parameters with the same areal density is also presented.
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Copper-coated laser-fusion targets using molecular-beam levitation
International Nuclear Information System (INIS)
Rocke, M.J.
1981-01-01
A series of diagnostic experiments at the Shiva laser fusion facility required targets of glass microspheres coated with 1.5 to 3.0 μm of copper. Previous batch coating efforts using vibration techniques gave poor results due to microsphere sticking and vacuum welding. Molecular Beam Levitation (MBL) represented a noncontact method to produce a sputtered copper coating on a single glassmicrosphere. The coating specifications that were achieved resulted in a copper layer up to 3 μm thick with the allowance of a maximum variation of 10 nm in surface finish and thickness. These techniques developed with the MBL may be applied to sputter coat many soft metals for fusion target applications
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Effects of primary selective laser trabeculoplasty on anterior segment parameters
Guven Yilmaz, Suzan; Palamar, Melis; Yusifov, Emil; Ates, Halil; Egrilmez, Sait; Yagci, Ayse
2015-01-01
AIM To investigate the effects of selective laser trabeculoplasty (SLT) on the main numerical parameters of anterior segment with Pentacam rotating Scheimpflug camera in patients with ocular hypertension (OHT) and primary open angle glaucoma (POAG). METHODS Pentacam measurements of 45 eyes of 25 (15 females and 10 males) patients (12 with OHT, 13 with POAG) before and after SLT were obtained. Measurements were taken before and 1 and 3mo after SLT. Pentacam parameters were compared between OHT and POAG patients, and age groups (60y and older, and younger than 60y). RESULTS The mean age of the patients was 57.8±13.9 (range 20-77y). Twelve patients (48%) were younger than 60y, while 13 patients (52%) were 60y and older. Measurements of pre-SLT and post-SLT 1mo were significantly different for the parameters of central corneal thickness (CCT) and anterior chamber volume (ACV) (P0.05). CONCLUSION SLT leads to significant increase in CCT and decrease in ACV at the 1st month of the procedure. Effects of SLT on these anterior segment parameters, especially for CCT that interferes IOP measurement, should be considered to ensure accurate clinical interpretation. PMID:26558208
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Time-resolved and doppler-reduced laser spectroscopy on atoms
International Nuclear Information System (INIS)
Bergstroem, H.
1991-10-01
Radiative lifetimes have been studied in neutral boron, carbon, silicon and strontium, in singly ionized gadolinium and tantalum and in molecular carbon monoxide and C 2 . The time-resolved techniques were based either on pulsed lasers or pulse-modulated CW lasers. Several techniques have been utilized for the production of free atoms and ions such as evaporation into an atomic beam, sputtering in hollow cathodes and laser-produced plasmas. Hyperfine interactions in boron, copper and strontium have been examined using quantum beat spectroscopy, saturation spectroscopy and collimated atomic beam spectroscopy. Measurement techniques based on effusive hollow cathodes as well as laser produced plasmas in atomic physics have been developed. Investigations on laser produced plasmas using two colour beam deflection tomography for determination of electron densities have been performed. Finally, new possibilities for view-time-expansion in light-in-flight holography using mode-locked CW lasers have been demonstrated. (au)
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Quantitative sputter profiling at surfaces and interfaces
International Nuclear Information System (INIS)
Kirschner, J.; Etzkorn, H.W.
1981-01-01
The key problem in quantitative sputter profiling, that of a sliding depth scale has been solved by combined Auger/X-ray microanalysis. By means of this technique and for the model system Ge/Si (amorphous) the following questions are treated quantitatively: shape of the sputter profiles when sputtering through an interface and origin of their asymmetry; precise location of the interface plane on the depth profile; broadening effects due to limited depth of information and their correction; origin and amount of bombardment induced broadening for different primary ions and energies; depth dependence of the broadening, and basic limits to depth resolution. Comparisons are made to recent theoretical calculations based on recoil mixing in the collision cascade and very good agreement is found
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Directory of Open Access Journals (Sweden)
Joaquin Ascorbe
2017-04-01
Full Text Available The refractive index of sputtered indium oxide nanocoatings has been altered just by changing the sputtering parameters, such as pressure. These induced changes have been exploited for the generation of a grating on the end facet of an optical fiber towards the development of wavelength-modulated optical fiber humidity sensors. A theoretical analysis has also been performed in order to study the different parameters involved in the fabrication of this optical structure and how they would affect the sensitivity of these devices. Experimental and theoretical results are in good agreement. A sensitivity of 150 pm/%RH was obtained for relative humidity changes from 20% to 60%. This kind of humidity sensors shows a maximum hysteresis of 1.3% relative humidity.
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Khomenkova, L.; Lehninger, D.; Kondratenko, O.; Ponomaryov, S.; Gudymenko, O.; Tsybrii, Z.; Yukhymchuk, V.; Kladko, V.; von Borany, J.; Heitmann, J.
2017-01-01
Ge-rich ZrO2 films, fabricated by confocal RF magnetron sputtering of pure Ge and ZrO2 targets in Ar plasma, were studied by multi-angle laser ellipsometry, Raman scattering, Auger electron spectroscopy, Fourier transform infrared spectroscopy, and X-ray diffraction for varied deposition conditions and annealing treatments. It was found that as-deposited films are homogeneous for all Ge contents, thermal treatment stimulated a phase separation and a formation of crystalline Ge and ZrO2. The ?...
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Anode sputtering characteristics of the Berkeley 2.5 MV source
International Nuclear Information System (INIS)
Gavin, B.
1975-10-01
An investigation was made of a number of parameters affecting the performance of the SuperHILAC 2.5 MV Adam injector source. The description will emphasize anode sputtered materials, and will discuss in some detail calcium and gold ion production. Parameters varied include electrode geometry, support gas type and electrode bias, to optimize beam intensity and electrode consumption. A factor of three improvement with high n + gold ions appears evident with a new displaced electrode geometry. The source is operated in cold mode, is pulsed and operates usually at less than 0.6 amperes average current. Under these conditions source life has been measured to be sixteen hours at 25 percent duty factor when generating calcium ions with neon support gas
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The corrosion and passivity of sputtered Mg–Ti alloys
International Nuclear Information System (INIS)
Song, Guang-Ling; Unocic, Kinga A.; Meyer, Harry; Cakmak, Ercan; Brady, Michael P.; Gannon, Paul E.; Himmer, Phil; Andrews, Quinn
2016-01-01
Highlights: • A supersaturated single phase Mg–Ti alloy can be obtained by magnetron sputtering. • The anodic dissolution of Mg–Ti alloy is inhibited by Ti addition. • The alloy becomes passive when Ti content is high and the alloy has become Ti based. • The formation of a continuous thin passive film is responsible for the passivation of the alloy. - Abstract: This study explored the possibility of forming a “stainless” Mg–Ti alloy. The electrochemical behavior of magnetron-sputtered Mg–Ti alloys was measured in a NaCl solution, and the surface films on the alloys were examined by XPS, SEM and TEM. Increased corrosion resistance was observed with increased Ti content in the sputtered Mg–Ti alloys, but passive-like behavior was not reached until the Ti level (atomic %) was higher than the Mg level. The surface film that formed on sputtered Mg–Ti based alloys in NaCl solution was thick, discontinuous and non-protective, whereas a thin, continuous and protective Mg and Ti oxide film was formed on a sputtered Ti–Mg based alloy.
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International Nuclear Information System (INIS)
Abdelhamid, M.; Fortes, F.J.; Fernández-Bravo, A.; Harith, M.A.; Laserna, J.J.
2013-01-01
Optical catapulting (OC) is a sampling and manipulation method that has been extensively studied in applications ranging from single cells in heterogeneous tissue samples to analysis of explosive residues in human fingerprints. Specifically, analysis of the catapulted material by means of laser-induced breakdown spectroscopy (LIBS) offers a promising approach for the inspection of solid particulate matter. In this work, we focus our attention in the experimental parameters to be optimized for a proper aerosol generation while increasing the particle density in the focal region sampled by LIBS. For this purpose we use shadowgraphy visualization as a diagnostic tool. Shadowgraphic images were acquired for studying the evolution and dynamics of solid aerosols produced by OC. Aluminum silicate particles (0.2–8 μm) were ejected from the substrate using a Q-switched Nd:YAG laser at 1064 nm, while time-resolved images recorded the propagation of the generated aerosol. For LIBS analysis and shadowgraphy visualization, a Q-switched Nd:YAG laser at 1064 nm and 532 nm was employed, respectively. Several parameters such as the time delay between pulses and the effect of laser fluence on the aerosol production have been also investigated. After optimization, the particle density in the sampling focal volume increases while improving the aerosol sampling rate till ca. 90%. - Highlights: • Aerosol generation by optical catapulting has been successfully optimized. • We study the evolution and dynamics of solid aerosols produced by OC. • We use shadowgraphy visualization as a diagnostic tool. • Effects of temporal conditions and laser fluence on the elevation of the aerosol cloud have been investigated. • The observed LIBS sampling rate increased from 50% reported before to approximately 90%
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Prater, Tracie
2016-01-01
Selective Laser Melting (SLM) is a powder bed fusion additive manufacturing process used increasingly in the aerospace industry to reduce the cost, weight, and fabrication time for complex propulsion components. SLM stands poised to revolutionize propulsion manufacturing, but there are a number of technical questions that must be addressed in order to achieve rapid, efficient fabrication and ensure adequate performance of parts manufactured using this process in safety-critical flight applications. Previous optimization studies for SLM using the Concept Laser M1 and M2 machines at NASA Marshall Space Flight Center have centered on machine default parameters. The objective of this work is to characterize the impact of higher throughput parameters (a previously unexplored region of the manufacturing operating envelope for this application) on material consolidation. In phase I of this work, density blocks were analyzed to explore the relationship between build parameters (laser power, scan speed, hatch spacing, and layer thickness) and material consolidation (assessed in terms of as-built density and porosity). Phase II additionally considers the impact of post-processing, specifically hot isostatic pressing and heat treatment, as well as deposition pattern on material consolidation in the same higher energy parameter regime considered in the phase I work. Density and microstructure represent the "first-gate" metrics for determining the adequacy of the SLM process in this parameter range and, as a critical initial indicator of material quality, will factor into a follow-on DOE that assesses the impact of these parameters on mechanical properties. This work will contribute to creating a knowledge base (understanding material behavior in all ranges of the AM equipment operating envelope) that is critical to transitioning AM from the custom low rate production sphere it currently occupies to the world of mass high rate production, where parts are fabricated at a rapid
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International Nuclear Information System (INIS)
Sathiya, P.; Panneerselvam, K.; Abdul Jaleel, M.Y.
2012-01-01
Highlights: ► Super austenitic stainless steel has successfully welded by laser welding with three different shielding gases. ► Among the three shielded joints, the helium shielded weld has more tensile strength. ► Neural network model was developed to predict the depth of penetration, bead width and tensile strength of the joints. ► The developed ANN model is suitably integrated with GA for optimization. -- Abstract: The laser welding input parameters play a very significant role in determining the quality of a weld joint. The quality of the joint can be defined in terms of properties such as weld bead geometry, mechanical properties and distortion. In particular mechanical properties should be controlled to obtain good welded joints. In this study, the weld bead geometry such as depth of penetration (DP), bead width (BW) and tensile strength (TS) of the laser welded butt joints made of AISI 904L super austenitic stainless steel are investigated. Full factorial design is used to carry out the experimental design. Artificial neural networks (ANNs) program was developed in MatLab software to establish the relationship between the laser welding input parameters like beam power, travel speed and focal position and the three responses DP, BW and TS in three different shielding gases (argon, helium and nitrogen). The established models are used for optimizing the process parameters using genetic algorithm (GA). Optimum solutions for the three different gases and their respective responses are obtained. Confirmation experiment has also been conducted to validate the optimized parameters obtained from GA.
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Balalykin, N. I.; Huran, J.; Nozdrin, M. A.; Feshchenko, A. A.; Kobzev, A. P.; Sasinková, V.; Boháček, P.; Arbet, J.
2018-03-01
N-doped carbon thin films were deposited on a silicon substrate and quartz glass by RF reactive magnetron sputtering using a carbon target and an Ar+N2 gas mixture. During the magnetron sputtering, the substrate holder temperatures was kept at 800 °C. The carbon film thickness on the silicon substrate was about 70 nm, while on the quartz glass it was in the range 15 nm – 60 nm. The elemental concentration in the films was determined by RBS and ERD. Raman spectroscopy was used to evaluate the intensity ratios I D/I G of the D and G peaks of the carbon films. The transmission photocathodes prepared were placed in the hollow-cathode assembly of a Pierce-structure DC gun to produce photoelectrons. The quantum efficiency (QE) was calculated from the laser energy and cathode charge measured. The properties of the transmission photocathodes based on semitransparent N-doped carbon thin films on quartz glass and their potential for application in DC gun technology are discussed.
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International Nuclear Information System (INIS)
Banerjee, Arghya Narayan; Joo, Sang Woo; Min, Bong-Ki
2013-01-01
A very thin amorphous carbon film (10–30 nm), has been bombarded with sputtered Cr nanoparticles, resulting in inelastic collision between the nanoparticles and the nuclei of the C-atoms causing atom displacement and re-arrangement into graphene layers. The process occurs at ambient temperature. Fabrication of graphitic microporous carbon terminated with few-to-multilayer graphene walls has been verified by Raman spectroscopy and scanning transmission electron microscopy. High resolution transmission electron micrographs reveal that the formation of graphene layers is highly sensitive to the sputtering parameters. With a gradual increase in the sputtering voltage/current density/time from 3.5 kV/40 mA–cm −2 /1.0 min to 5.0 kV/70 mA–cm −2 /3.0 min the graphitic domains are found to transform from semi-graphitized layers to well-defined, highly ordered, larger-area graphene walls within the microporous network. The mechanism of this graphitic microporous carbon formation is assumed to be due to two simultaneous processes: in one hand, the sputtering plasma, containing energetic ions and sub-atomic particles, act as dry-etchant to activate the a:C film to transform it into microporous carbon, whereas on the other hand, the charged metal nanoparticle/ion bombardment under sputtering resulted in the inelastic collision between the nanoparticles/ions and the nuclei of the C atoms followed by atom displacement (and displacement cascade) and re-arrangement into ordered structure to form graphitic domains within the microporous carbon network. H 2 storage experiment of the samples depicts excellent hydrogen storage properties. This simple, cost-effective, complementary-metal-oxide-semiconductor-compatible, single-step process of metal-graphene hybrid nanomaterial formation may find interesting applications in the field of optoelectronics and biotechnology. Additionally, this method can be adopted easily for the incorporation of transition metals into graphene and
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International Nuclear Information System (INIS)
Abdul Fatah Awang Mat
1988-01-01
The effect of thermal annealing on structural and optical properties of amorphous silicon are studied on samples prepared by radio-frequency sputtering. The fundamental absorption edge of these films are investigated at room temperature and their respective parameters estimated. Annealing effect on optical properties is interpreted in terms of the removal of voids and a decrease of disorder. (author)
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Effect of sputtering on self-damaged ITER-grade tungsten
Energy Technology Data Exchange (ETDEWEB)
Voitsenya, V.S., E-mail: voitseny@ipp.kharkov.ua [Institute of Plasma Physics, National Scientific Center “Kharkov Institute of Physics and Technology”, 61108 Kharkov (Ukraine); Balden, M. [Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching (Germany); Bardamid, A.F. [Taras Shevchenko National University, 01033 Kiev (Ukraine); Belyaeva, A.I. [National Technical University “Kharkov Polytechnical Institute”, 61002 Kharkov (Ukraine); Bondarenko, V.N.; Skoryk, O.O.; Shtan’, A.F.; Solodovchenko, S.I. [Institute of Plasma Physics, National Scientific Center “Kharkov Institute of Physics and Technology”, 61108 Kharkov (Ukraine); Sterligov, V.A. [Institute of Semiconductor Physics, NAS of Ukraine, 03028 Kiev (Ukraine); Tyburska-Püschel, B. [Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-85748 Garching (Germany)
2014-10-15
Simulation of neutron irradiation and sputtering on ITER-grade tungsten was studied. The effects of neutron-induced displacement damage have been simulated by irradiation of tungsten target with W{sup 6+} ions of 20 MeV energy. Bombardment by Ar{sup +} ions with energy 600 eV was used as imitation of impact of charge exchange atoms in ITER. The sputtering process was interrupted to perform in between measurements of the optical properties of the eroded surface and the mass loss. After sputtering was finished, the surface was thoroughly investigated by different methods for characterizing the surface relief developed due to sputtering. The damaging to, at least, the level that would be achieved in ITER does not lead to a decisive additional contribution to the processes under impact of charge exchange atoms only.
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Sputtering of Au induced by single Xe ion impacts
International Nuclear Information System (INIS)
Birtcher, R. C.; Donnelly, S. E.
1999-01-01
Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry
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AFM characterization of nonwoven material functionalized by ZnO sputter coating
International Nuclear Information System (INIS)
Deng Bingyao; Yan Xiong; Wei Qufu; Gao Weidong
2007-01-01
Sputter coatings provide new approaches to the surface functionalization of textile materials. In this study, polyethylene terephthalate (PET) nonwoven material was used as a substrate for creating functional nanostructures on the fiber surfaces. A magnetron sputter coating was used to deposit functional zinc oxide (ZnO) nanostructures onto the nonwoven substrate. The evolution of the surface morphology of the fibers in the nonwoven web was examined using atomic force microscopy (AFM). The AFM observations revealed a significant difference in the morphology of the fibers before and after the sputter coating. The AFM images also indicated the effect of the sputtering conditions on the surface morphology of the fibers. The increase in the sputtering time led to the growth of the ZnO grains on the fiber surfaces. The higher pressure in the sputtering chamber could cause the formation of larger grains on the fiber surfaces. The higher power used also generated larger grains on the fiber surfaces
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Effects of primary selective laser trabeculoplasty on anterior segment parameters
Directory of Open Access Journals (Sweden)
Suzan Guven Yilmaz
2015-10-01
Full Text Available AIM:To investigate the effects of selective laser trabeculoplasty (SLT on the main numerical parameters of anterior segment with Pentacam rotating Scheimpflug camera in patients with ocular hypertension (OHT and primary open angle glaucoma (POAG.METHODS: Pentacam measurements of 45 eyes of 25 (15 females and 10 males patients (12 with OHT, 13 with POAG before and after SLT were obtained. Measurements were taken before and 1 and 3mo after SLT. Pentacam parameters were compared between OHT and POAG patients, and age groups (60y and older, and younger than 60y.RESULTS: The mean age of the patients was 57.8±13.9 (range 20-77y. Twelve patients (48% were younger than 60y, while 13 patients (52% were 60y and older. Measurements of pre-SLT and post-SLT 1mo were significantly different for the parameters of central corneal thickness (CCT and anterior chamber volume (ACV (P<0.05. These parameters returned back to pre-SLT values at post-SLT 3mo. Decrease of ACV at post-SLT 1mo was significantly higher in younger than 60y group than 60y and older group. There was no statistically significant difference in Pentacam parameters between OHT and POAG patients at pre- and post-treatment measurements (P>0.05.CONCLUSION:SLT leads to significant increase in CCT and decrease in ACV at the 1st month of the procedure. Effects of SLT on these anterior segment parameters, especially for CCT that interferes IOP measurement, should be considered to ensure accurate clinical interpretation.
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A thermodynamic model of plasma generation by pulsed laser irradiation in vacuum
Tosto, S
2003-01-01
This paper introduces a thermodynamic model to determine composition, temperature and pressure of the plasma cloud induced by pulsed laser irradiation in the case where a relevant thermal sputtering mechanism is operating at the surface of a molten layer. The model concerns in particular pulse lengths of the order of several nanoseconds and completes the results of a previous paper concerning the physics of the evaporation and boiling driven thermal sputtering (Tosto S 2002 J. Phys. D: Appl. Phys. 35); the recession rate and temperature at the molten surface are linked to the pulse fluence and plasma properties in the frame of a unique physical model. This paper shows that the plasma properties depend critically on the non-equilibrium character of the surface evaporation and boiling mechanisms. The extension of the model to the case of continuous laser irradiation is also discussed. Some examples of computer simulation aim to show the results available in the particular case of a metal target; the comparison ...
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Energy Technology Data Exchange (ETDEWEB)
Isselhardt, Brett H. [Univ. of California, Berkeley, CA (United States)
2011-09-01
Resonance Ionization Mass Spectrometry (RIMS) has been developed as a method to measure relative uranium isotope abundances. In this approach, RIMS is used as an element-selective ionization process to provide a distinction between uranium atoms and potential isobars without the aid of chemical purification and separation. We explore the laser parameters critical to the ionization process and their effects on the measured isotope ratio. Specifically, the use of broad bandwidth lasers with automated feedback control of wavelength was applied to the measurement of 235U/238U ratios to decrease laser-induced isotopic fractionation. By broadening the bandwidth of the first laser in a 3-color, 3-photon ionization process from a bandwidth of 1.8 GHz to about 10 GHz, the variation in sequential relative isotope abundance measurements decreased from >10% to less than 0.5%. This procedure was demonstrated for the direct interrogation of uranium oxide targets with essentially no sample preparation. A rate equation model for predicting the relative ionization probability has been developed to study the effect of variation in laser parameters on the measured isotope ratio. This work demonstrates that RIMS can be used for the robust measurement of uranium isotope ratios.
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Wu, Yueh-Feng; Wang, Shiou-Han; Wu, Pei-Shan; Fan, Sabrina Mai-Yi; Chiu, Hsien-Yi; Tsai, Tsung-Hua; Lin, Sung-Jan
2015-04-01
Identification of methods to enhance anagen entry can be helpful for alopecia. Recently, nonablative laser has been proposed as a potential treatment for alopecia. However, how the laser parameters affect stem cell activity, hair cycles and the associated side effects have not been well characterized. Here we examine the effects of irradiation parameters of 1,550-nm fractional laser on hair cycles. The dorsal skin of eight-week-old female C57BL/6 mice with hair follicles in synchronized telogen was shaved and irradiated with a 1,550-nm fractional erbium-glass laser (Fraxel RE:STORE (SR1500) Laser System, Solta Medical, U.S.A.) with varied beam energies (5-35 mJ) and beam densities (500-3500 microthermal zones/cm(2) ). The cutaneous changes were evaluated both grossly and histologically. Hair follicle stem cell activity was detected by BrdU incorporation and changes in gene expression were quantified by real-time PCR. Direct thermal injury to hair follicles could be observed early after irradiation, especially at higher beam energy. Anagen induction in the irradiated skin showed an all-or-non change. Anagen induction and ulcer formation were affected by the combination of beam energy and density. The lowest beam energy of 5 mJ failed to promote anagen entry at all beam densities tested. As beam energy increased from 10 mJ to 35 mJ, we found a decreasing trend of beam density that could induce anagen entry within 7-9 days with activation of hair follicle stem cells. Beam density above the pro-regeneration density could lead to ulcers and scarring followed by anagen entry in adjacent skin. Analysis of inflammatory cytokines, including TNF-α, IL-1β, and IL-6, revealed that transient moderate inflammation was associated with anagen induction and intense prolonged inflammation preceded ulcer formation. To avoid side effects of hair follicle injury and scarring, appropriate combination of beam energy and density is required. Parameters outside the therapeutic
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Hybrid laser technology and doped biomaterials
Jelínek, Miroslav; Zemek, Josef; Remsa, Jan; Mikšovský, Jan; Kocourek, Tomáš; Písařík, Petr; Trávníčková, Martina; Filová, Elena; Bačáková, Lucie
2017-09-01
Hybrid laser-based technologies for deposition of new types of doped thin films are presented. The focus is on arrangements combining pulsed laser deposition (PLD) with magnetron sputtering (MS), and on the setup with two simultaneously running PLD systems (dual PLD). Advantages and disadvantages of both arrangements are discussed. Layers of different dopants concentration were prepared. Experience with deposition of chromium and titanium doped diamond-like carbon (DLC) films for potential coating of bone implants is presented. Properties of the layers prepared by both technologies are compared and discussed. The suitability of the layers for colonization with human bone marrow mesenchymal stem cells and human osteoblast-like cells, were also evaluated under in vitro conditions.
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Measurement of laser absorptivity for operating parameters characteristic of laser drilling regime
Energy Technology Data Exchange (ETDEWEB)
Schneider, M; Berthe, L; Fabbro, R; Muller, M [Laboratoire pour l' Application des Lasers de Puissance, UPR CNRS no1578, 16 Bis, Avenue Prieur de la Cote D' Or, 94114 Arcueil Cedex (France)], E-mail: matthieu.schneider@gmail.com
2008-08-07
Laser drilling in the percussion regime is commonly used in the aircraft industry to drill sub-millimetre holes in metallic targets. Characteristic laser intensities in the range of 10 MW cm{sup -2} are typically employed for drilling metallic targets. With these intensities the temperature of the irradiated matter is above the vaporization temperature and the drilling process is led by hydrodynamic effects. Although the main physical processes involved are identified, this process is not correctly understood or completely controlled. A major characteristic coefficient of laser-matter interaction for this regime, which is the absorptivity of the laser on the irradiated surface, is still unknown, because of the perturbing effects due to laser beam geometrical trapping inside the drilled hole. So, by using time resolved experiments, this study deals with the direct measurement of the variation of the intrinsic absorption of aluminium, nickel and steel materials, as a function of the incident laser intensity up to 20 MW cm{sup -2}. We observe that for this incident intensity, the absorptivity can reach up to 80%. This very high and unexpected value is discussed by considering the microscopic behaviour of the heated matter near the vapour-liquid interface that undergoes possible Rayleigh-Taylor instability or volume absorption.
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Measurement of laser absorptivity for operating parameters characteristic of laser drilling regime
Schneider, M.; Berthe, L.; Fabbro, R.; Muller, M.
2008-08-01
Laser drilling in the percussion regime is commonly used in the aircraft industry to drill sub-millimetre holes in metallic targets. Characteristic laser intensities in the range of 10 MW cm-2 are typically employed for drilling metallic targets. With these intensities the temperature of the irradiated matter is above the vaporization temperature and the drilling process is led by hydrodynamic effects. Although the main physical processes involved are identified, this process is not correctly understood or completely controlled. A major characteristic coefficient of laser-matter interaction for this regime, which is the absorptivity of the laser on the irradiated surface, is still unknown, because of the perturbing effects due to laser beam geometrical trapping inside the drilled hole. So, by using time resolved experiments, this study deals with the direct measurement of the variation of the intrinsic absorption of aluminium, nickel and steel materials, as a function of the incident laser intensity up to 20 MW cm-2. We observe that for this incident intensity, the absorptivity can reach up to 80%. This very high and unexpected value is discussed by considering the microscopic behaviour of the heated matter near the vapour-liquid interface that undergoes possible Rayleigh-Taylor instability or volume absorption.
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Cell adhesion on NiTi thin film sputter-deposited meshes
Energy Technology Data Exchange (ETDEWEB)
Loger, K. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Engel, A.; Haupt, J. [Department of Cardiovascular Surgery, University Hospital of Schleswig-Holstein, Kiel (Germany); Li, Q. [Biocompatible Nanomaterials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Lima de Miranda, R. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); ACQUANDAS GmbH, Kiel (Germany); Quandt, E. [Inorganic Functional Materials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany); Lutter, G. [Department of Cardiovascular Surgery, University Hospital of Schleswig-Holstein, Kiel (Germany); Selhuber-Unkel, C. [Biocompatible Nanomaterials, Institute for Materials Science, Faculty of Engineering, University of Kiel (Germany)
2016-02-01
Scaffolds for tissue engineering enable the possibility to fabricate and form biomedical implants in vitro, which fulfill special functionality in vivo. In this study, free-standing Nickel–Titanium (NiTi) thin film meshes were produced by means of magnetron sputter deposition. Meshes contained precisely defined rhombic holes in the size of 440 to 1309 μm{sup 2} and a strut width ranging from 5.3 to 9.2 μm. The effective mechanical properties of the microstructured superelastic NiTi thin film were examined by tensile testing. These results will be adapted for the design of the holes in the film. The influence of hole and strut dimensions on the adhesion of sheep autologous cells (CD133 +) was studied after 24 h and after seven days of incubation. Optical analysis using fluorescence microscopy and scanning electron microscopy showed that cell adhesion depends on the structural parameters of the mesh. After 7 days in cell culture a large part of the mesh was covered with aligned fibrous material. Cell adhesion is particularly facilitated on meshes with small rhombic holes of 440 μm{sup 2} and a strut width of 5.3 μm. Our results demonstrate that free-standing NiTi thin film meshes have a promising potential for applications in cardiovascular tissue engineering, particularly for the fabrication of heart valves. - Highlights: • Freestanding NiTi thin film scaffolds were fabricated with magnetron sputtering process. • Effective mechanical properties of NiTi scaffolds can be adapted by the mesh structure parameters. • Cell adhesion on the NiTi thin film scaffold is controlled by the structure parameters of the mesh. • Cells strongly adhere after seven days and form a confluent layer on the mesh.
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Cell adhesion on NiTi thin film sputter-deposited meshes
International Nuclear Information System (INIS)
Loger, K.; Engel, A.; Haupt, J.; Li, Q.; Lima de Miranda, R.; Quandt, E.; Lutter, G.; Selhuber-Unkel, C.
2016-01-01
Scaffolds for tissue engineering enable the possibility to fabricate and form biomedical implants in vitro, which fulfill special functionality in vivo. In this study, free-standing Nickel–Titanium (NiTi) thin film meshes were produced by means of magnetron sputter deposition. Meshes contained precisely defined rhombic holes in the size of 440 to 1309 μm 2 and a strut width ranging from 5.3 to 9.2 μm. The effective mechanical properties of the microstructured superelastic NiTi thin film were examined by tensile testing. These results will be adapted for the design of the holes in the film. The influence of hole and strut dimensions on the adhesion of sheep autologous cells (CD133 +) was studied after 24 h and after seven days of incubation. Optical analysis using fluorescence microscopy and scanning electron microscopy showed that cell adhesion depends on the structural parameters of the mesh. After 7 days in cell culture a large part of the mesh was covered with aligned fibrous material. Cell adhesion is particularly facilitated on meshes with small rhombic holes of 440 μm 2 and a strut width of 5.3 μm. Our results demonstrate that free-standing NiTi thin film meshes have a promising potential for applications in cardiovascular tissue engineering, particularly for the fabrication of heart valves. - Highlights: • Freestanding NiTi thin film scaffolds were fabricated with magnetron sputtering process. • Effective mechanical properties of NiTi scaffolds can be adapted by the mesh structure parameters. • Cell adhesion on the NiTi thin film scaffold is controlled by the structure parameters of the mesh. • Cells strongly adhere after seven days and form a confluent layer on the mesh.
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Evaluation of residual stress in sputtered tantalum thin-film
Energy Technology Data Exchange (ETDEWEB)
Al-masha’al, Asa’ad, E-mail: asaad.al@ed.ac.uk; Bunting, Andrew; Cheung, Rebecca
2016-05-15
Highlights: • Tantalum thin-films have been deposited by DC magnetron sputtering system. • Thin-film stress is observed to be strongly influenced by sputtering pressure. • Transition towards the compressive stress is ascribed to the annealing at 300 °C. • Expose thin-film to air ambient or ion bombardment lead to a noticeable change in the residual stress. - Abstract: The influence of deposition conditions on the residual stress of sputtered tantalum thin-film has been evaluated in the present study. Films have been deposited by DC magnetron sputtering and curvature measurement method has been employed to calculate the residual stress of the films. Transitions of tantalum film stress from compressive to tensile state have been observed as the sputtering pressure increases. Also, the effect of annealing process at temperature range of 90–300 °C in oxygen ambient on the residual stress of the films has been studied. The results demonstrate that the residual stress of the films that have been deposited at lower sputtering pressure has become more compressive when annealed at 300 °C. Furthermore, the impact of exposure to atmospheric ambient on the tantalum film stress has been investigated by monitoring the variation of the residual stress of both annealed and unannealed films over time. The as-deposited films have been exposed to pure Argon energy bombardment and as result, a high compressive stress has been developed in the films.
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Energy sharing and sputtering in low-energy collision cascades
International Nuclear Information System (INIS)
Weller, R.A.; Weller, M.R.
1982-01-01
Using a non-linear transport equation to describe the energy-sharing process in an isotropic collision cascade, we have numerically calculated sputtered particle velocity spectra for several very low energy (=< 10 eV) primary recoil distributions. Our formulation of the sputtering process is essentially that used in the linear model and our equations yield the familiar linear model results in the appropriate limit. Discrepancies between our calculations and the linear model results in other cases may be understood by considering the effects of the linear model assumptions on the sputtering yield at very low energies. Our calculations are also compared with recent experimental results investigating ion-explosion sputtering. The results of this comparison support the conclusion that in insulators sputtering is initiated by very low energy recoil atoms when the energy of the incident beam is high enough that the stopping power is dominated by the electronic contribution. The calculations also suggest that energy spectra similar to those for evaporation may result from non-equilibrium processes but that the apparent temperatures of evaporation are not related in a simple way to any real temperature within the target. (author)
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Hong, Min-Ho; Son, Jun Sik; Kwon, Tae-Yub
2018-03-01
The selective laser melting (SLM) process parameters, which directly determine the melting behavior of the metallic powders, greatly affect the nanostructure and surface roughness of the resulting 3D object. This study investigated the effect of various laser process parameters (laser power, scan rate, and scan line spacing) on the surface roughness of a nickel-chromium (Ni-Cr) alloy that was three-dimensionally (3D) constructed using SLM. Single-line formation tests were used to determine the optimal laser power of 200 W and scan rate of 98.8 mm/s, which resulted in beads with an optimal profile. In the subsequent multi-layer formation tests, the 3D object with the smoothest surface (Ra = 1.3 μm) was fabricated at a scan line spacing of 60 μm (overlap ratio = 73%). Narrow scan line spacing (and thus large overlap ratios) was preferred over wide scan line spacing to reduce the surface roughness of the 3D body. The findings of this study suggest that the laser power, scan rate, and scan line spacing are the key factors that control the surface quality of Ni-Cr alloys produced by SLM.
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Magnetospheric ion sputtering and water ice grain size at Europa
Cassidy, T. A.; Paranicas, C. P.; Shirley, J. H.; Dalton, J. B., III; Teolis, B. D.; Johnson, R. E.; Kamp, L.; Hendrix, A. R.
2013-03-01
We present the first calculation of Europa's sputtering (ion erosion) rate as a function of position on Europa's surface. We find a global sputtering rate of 2×1027 H2O s-1, some of which leaves the surface in the form of O2 and H2. The calculated O2 production rate is 1×1026 O2 s-1, H2 production is twice that value. The total sputtering rate (including all species) peaks at the trailing hemisphere apex and decreases to about 1/3rd of the peak value at the leading hemisphere apex. O2 and H2 sputtering, by contrast, is confined almost entirely to the trailing hemisphere. Most sputtering is done by energetic sulfur ions (100s of keV to MeV), but most of the O2 and H2 production is done by cold oxygen ions (temperature ∼ 100 eV, total energy ∼ 500 eV). As a part of the sputtering rate calculation we compared experimental sputtering yields with analytic estimates. We found that the experimental data are well approximated by the expressions of Famá et al. for ions with energies less than 100 keV (Famá, M., Shi, J., Baragiola, R.A., 2008. Sputtering of ice by low-energy ions. Surf. Sci. 602, 156-161), while the expressions from Johnson et al. fit the data best at higher energies (Johnson, R.E., Burger, M.H., Cassidy, T.A., Leblanc, F., Marconi, M., Smyth, W.H., 2009. Composition and Detection of Europa's Sputter-Induced Atmosphere, in: Pappalardo, R.T., McKinnon, W.B., Khurana, K.K. (Eds.), Europa. University of Arizona Press, Tucson.). We compare the calculated sputtering rate with estimates of water ice regolith grain size as estimated from Galileo Near-Infrared Mapping Spectrometer (NIMS) data, and find that they are strongly correlated as previously suggested by Clark et al. (Clark, R.N., Fanale, F.P., Zent, A.P., 1983. Frost grain size metamorphism: Implications for remote sensing of planetary surfaces. Icarus 56, 233-245.). The mechanism responsible for the sputtering rate/grain size link is uncertain. We also report a surface composition estimate using
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Laser cleaning of diagnostic mirrors from tokamak-like carbon contaminants
Energy Technology Data Exchange (ETDEWEB)
Maffini, A., E-mail: alessandro.maffini@polimi.it [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Uccello, A. [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Dellasega, D. [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan (Italy); Russo, V. [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Perissinotto, S. [Center for Nano Science and Technology @ Polimi, Istituto Italiano di Tecnologia, Milan (Italy); Passoni, M. [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan (Italy)
2015-08-15
This paper presents a laboratory-scale experimental investigation of laser cleaning of diagnostic First Mirrors (FMs). Redeposition of contaminants sputtered from tokamak first wall onto FMs surface could dramatically decrease their reflectivity in an unacceptable way for the functioning of the plasma diagnostic systems. Laser cleaning is a promising solution to tackle this issue. In this work, pulsed laser deposition was exploited to produce rhodium films functional as FMs and to deposit onto them carbon contaminants with tailored features, resembling those found in tokamaks. The same laser system was also used to perform laser cleaning experiments by means of a sample handling procedure that allows to clean some cm{sup 2} in few minutes. The cleaning effectiveness was evaluated in terms of specular reflectivity recovery and mirror surface integrity. The effect of different laser wavelengths (λ = 1064, 266 nm) on the cleaning process is also addressed.
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Photonometers for coating and sputtering machines
Oupický, P.; Jareš, D.; Václavík, J.; Vápenka, D.
2013-04-01
The concept of photonometers (alternative name of optical monitor of a vacuum deposition process) for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR) for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.
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Energy Technology Data Exchange (ETDEWEB)
Xie, Wuze; Jiao, Shujie, E-mail: shujiejiao@gmail.com; Wang, Dongbo; Gao, Shiyong; Wang, Jinzhong; Yu, Qingjiang; Li, Hongtao
2017-05-31
Highlights: • MgNiO thin films were fabricated by radio frequency magnetron sputtering. • The structure and optical properties of MgNiO films were studied. • The mechanism of phase separation was discussed in detail. • The effect of different sputtering pressure also was discussed. - Abstract: In this study, MgNiO thin films were grown on quartz substrates by radio frequency (RF) magnetron sputtering. The influence of different sputtering pressures on the crystalline and optical properties of MgNiO thin films has been studied. X-ray diffraction measurement indicates that the MgNiO films are cubic structure with (200) preferred orientation. UV–vis transmission spectra show that all the MgNiO thin films show more than 75% transmission at visible region, and the absorption edges of all thin films locate at solar-blind region (220 nm–280 nm). The lattice constant and Mg content of MgNiO samples were calculated using X-ray diffraction and transmission spectra data. The phase separation is observed both in the X-ray diffraction patterns and transmission spectra, and the phase separation is studied in detail based on the crystal growth theory and sputtering process.
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SU-E-J-161: Inverse Problems for Optical Parameters in Laser Induced Thermal Therapy
International Nuclear Information System (INIS)
Fahrenholtz, SJ; Stafford, RJ; Fuentes, DT
2014-01-01
Purpose: Magnetic resonance-guided laser-induced thermal therapy (MRgLITT) is investigated as a neurosurgical intervention for oncological applications throughout the body by active post market studies. Real-time MR temperature imaging is used to monitor ablative thermal delivery in the clinic. Additionally, brain MRgLITT could improve through effective planning for laser fiber's placement. Mathematical bioheat models have been extensively investigated but require reliable patient specific physical parameter data, e.g. optical parameters. This abstract applies an inverse problem algorithm to characterize optical parameter data obtained from previous MRgLITT interventions. Methods: The implemented inverse problem has three primary components: a parameter-space search algorithm, a physics model, and training data. First, the parameter-space search algorithm uses a gradient-based quasi-Newton method to optimize the effective optical attenuation coefficient, μ-eff. A parameter reduction reduces the amount of optical parameter-space the algorithm must search. Second, the physics model is a simplified bioheat model for homogeneous tissue where closed-form Green's functions represent the exact solution. Third, the training data was temperature imaging data from 23 MRgLITT oncological brain ablations (980 nm wavelength) from seven different patients. Results: To three significant figures, the descriptive statistics for μ-eff were 1470 m −1 mean, 1360 m −1 median, 369 m −1 standard deviation, 933 m −1 minimum and 2260 m −1 maximum. The standard deviation normalized by the mean was 25.0%. The inverse problem took <30 minutes to optimize all 23 datasets. Conclusion: As expected, the inferred average is biased by underlying physics model. However, the standard deviation normalized by the mean is smaller than literature values and indicates an increased precision in the characterization of the optical parameters needed to plan MRgLITT procedures. This investigation
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Stancalie, A.; Ciobanu, S. S.; Sporea, D.
2017-09-01
A detailed theoretical and experimental analysis is performed for a wide range of laser operating conditions, typical for laser induced breakdown spectroscopy (LIBS) and laser ablation (LA) experiments on copper metallic target. The plasma parameters were experimentally estimated from the line intensities ratio which reflects the relative population of neutral excited species in the plasma. In the case of LA experiments the highest temperature observed was 8210 ± 370 K. In case of LIBS measurements, a maximum temperature of 8123 K has been determined. The experimental results are in good agreement with a stationary, hydrodynamic model. We have theoretically investigated the plasma emission based on the generalized collisional-radiative model as implemented in the ADAS interconnected set of computer codes and data collections. The ionic population density distribution over the ground and excited states into the cooper plasma is graphically displayed as output from the code. The theoretical line intensity ratios are in good agreement with experimental values for the electron density and temperature range measured in our experiments.
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Design windows of laser fusion power plants and conceptual design of laser-diode pumped slab laser
International Nuclear Information System (INIS)
Kozaki, Y.; Eguchi, T.; Izawa, Y.
1999-01-01
An analysis of the design space available to laser fusion power plants has been carried out, in terms of design key parameters such as target gain, laser energy and laser repetition rate, the number of fusion react ion chambers, and plant size. The design windows of economically attractive laser fusion plants is identified with the constraints of key design parameters and the cost conditions. Especially, for achieving high repetition rate lasers, we have proposed and designed a diode-pumped solid-state laser driver which consists of water-cooled zig-zag path slab amplifiers. (author)
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Laser parameters, focusing optics, and side effects in femtosecond laser corneal surgery
Plamann, Karsten; Nuzzo, Valeria; Peyrot, Donald A.; Deloison, Florent; Savoldelli, Michèle; Legeais, Jean-Marc
2008-02-01
Nowadays, femtosecond lasers are routinely used in refractive eye surgery. Until recently, commercialised clinical systems were exclusively based on ytterbium or neodymium-doped solid state lasers emitting sub-picosecond pulses at a wavelength of about 1 μm and repetition rates of a few 10 kHz. These systems use pulse energies in the μJ range and focussing optics of NA = 0.3 to 0.5. Recent developments have provided a variety of alternative and equally viable approaches: systems are now available using nJ pulses at high numerical apertures and MHz repetition rates - an approach so far only used for femtosecond cell surgery - and fibre laser technology is now being used for femtosecond laser corneal surgery. Recent research has also provided more insight in side effects occurring in present systems: self focusing phenomena and so far unexplained periodical structures have been observed even at high numerical apertures (NA >> 0.5) and moderate pulse energies. The interaction of femtosecond laser pulses with strongly scattering tissue has been studied in view of extending the application of femtosecond lasers to keratoplasty for opaque corneas and to glaucoma surgery. The use of new laser wavelengths and adaptive optics has been proposed. Despite the reputation of femtosecond surgical systems for their precision, repeatability and the absence of secondary effects or complications, a closer examination reveals the presence of subtle phenomena which merit further investigation. We present three of these phenomena: the influence of optical aberration on the quality of the incision, the occurrence of filamentation effects, and the deposit of microscopic glass fragments when performing penetrating incisions.
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Physical characterization of sputter-deposited amorphous tungsten oxynitride thin films
Energy Technology Data Exchange (ETDEWEB)
Nunez, O.R.; Moreno Tarango, A.J. [Department of Mechanical Engineering, University of Texas at El Paso, El Paso, TX 79968 (United States); Murphy, N.R. [Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base (WPAFB), Dayton, OH 45433 (United States); Phinney, L.C.; Hossain, K. [Amethyst Research Inc., 123 Case Circle, Ardmore, OK 73401 (United States); Ramana, C.V., E-mail: rvchintalapalle@utep.edu [Department of Mechanical Engineering, University of Texas at El Paso, El Paso, TX 79968 (United States)
2015-12-01
Tungsten oxynitride (W–O–N) thin films were deposited onto silicon (100) and quartz substrates using direct current (DC) sputtering. Composition variations in the W–O–N films were obtained by varying the nitrogen gas flow rate from 0 to 20 sccm, while keeping the total gas flow constant at 40 sccm using 20 sccm of argon with the balance comprised of oxygen. The resulting crystallinity, optical properties, and chemical composition of the DC sputtered W–O–N films were evaluated. All the W–O–N films measured were shown to be amorphous using X-ray diffraction. Spectrophotometry results indicate that the optical parameters, namely, the transmission magnitude and band gap (E{sub g}), are highly dependent on the nitrogen content in the reactive gas mixture. Within the W–O–N system, E{sub g} was able to be precisely tailored between 2.9 eV and 1.9 eV, corresponding to fully stoichiometric WO{sub 3} and highly nitrided W–O–N, respectively. Rutherford backscattering spectrometry (RBS) coupled with X-ray photoelectron spectroscopy (XPS) measurements indicate that the composition of the films varies from WO{sub 3} to W–O–N composite oxynitride films. - Highlights: • W–O–N films of ~ 100 nm thick were sputter-deposited by varying nitrogen gas flow rate. • Nitrogen incorporation into W-oxide is effective at or after 9 sccm flow rate of nitrogen. • The band gap significantly decreases from ~ 3.0 eV to ~ 2.1 eV with progressive increase in nitrogen content. • A composite oxide-semiconductor of W–O–N is proposed to explain the optical properties.
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Fabrication of amplitude-phase type diffractive optical elements in aluminium films
Fomchenkov, S. A.; Butt, M. A.
2017-11-01
In the course of studies have been conducted a method of forming the phase diffractive optical elements (DOEs) by direct laser writing in thin films of aluminum. The quality of the aluminum films were investigated depending on the parameters of magnetron sputtering process. Moreover, the parameters of the laser writing process in thin films of aluminum were optimized. The structure of phase diffractive optical elements was obtained by the proposed method.
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Laser-assisted preparation and photoelectric properties of grating-structured Pt/FTO thin films
Energy Technology Data Exchange (ETDEWEB)
Ren, Nai-fei, E-mail: rnf_ujs@126.com [School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013 (China); Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); Huang, Li-jing, E-mail: lij_huang@126.com [Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013 (China); Li, Bao-jia [Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013 (China); Zhou, Ming [Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); The State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China)
2014-09-30
Highlights: • Pt layers were deposited by DC magnetron sputtering on commercial FTO glasses. • Pt/FTO films were irradiated by laser for inducing gratings and annealing. • An ideal grating-structured Pt/FTO film was obtained using a fluence of 1.05 J/cm{sup 2}. • The grating-structured Pt/FTO film exhibited excellent photoelectric properties. • Laser-assisted treatment is effective for improving performance of FTO-based films. - Abstract: In order to improve the transparency and conductivity of commercial fluorine-doped tin oxide (FTO) glass, platinum (Pt) layers were deposited on the FTO film by direct current (DC) magnetron sputtering, followed by being irradiating with a 532 nm nanosecond pulsed laser for the dual purpose of inducing grating structures and annealing. Introducing a Pt layer decreased the average transmittance (400–800 nm) and the sheet resistance of the initial FTO film from 80.2% and 8.4 Ω/sq to 68.6% and 7.9 Ω/sq, respectively. The ideal grating-structured Pt/FTO film was obtained by laser irradiation with a fluence of 1.05 J/cm{sup 2}, and X-ray diffraction (XRD) analysis confirmed that this film underwent optimal annealing. As a result, it exhibited an average transmittance (400–800 nm) of 84.1% and a sheet resistance of 6.8 Ω/sq. These results indicated that laser-assisted treatment combined with introduction of metal layer can effectively improve photoelectric properties of FTO single-layer films.
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Multiphase flow parameter estimation based on laser scattering
Vendruscolo, Tiago P.; Fischer, Robert; Martelli, Cicero; Rodrigues, Rômulo L. P.; Morales, Rigoberto E. M.; da Silva, Marco J.
2015-07-01
The flow of multiple constituents inside a pipe or vessel, known as multiphase flow, is commonly found in many industry branches. The measurement of the individual flow rates in such flow is still a challenge, which usually requires a combination of several sensor types. However, in many applications, especially in industrial process control, it is not necessary to know the absolute flow rate of the respective phases, but rather to continuously monitor flow conditions in order to quickly detect deviations from the desired parameters. Here we show how a simple and low-cost sensor design can achieve this, by using machine-learning techniques to distinguishing the characteristic patterns of oblique laser light scattered at the phase interfaces. The sensor is capable of estimating individual phase fluxes (as well as their changes) in multiphase flows and may be applied to safety applications due to its quick response time.
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Multiphase flow parameter estimation based on laser scattering
International Nuclear Information System (INIS)
Vendruscolo, Tiago P; Fischer, Robert; Martelli, Cicero; Da Silva, Marco J; Rodrigues, Rômulo L P; Morales, Rigoberto E M
2015-01-01
The flow of multiple constituents inside a pipe or vessel, known as multiphase flow, is commonly found in many industry branches. The measurement of the individual flow rates in such flow is still a challenge, which usually requires a combination of several sensor types. However, in many applications, especially in industrial process control, it is not necessary to know the absolute flow rate of the respective phases, but rather to continuously monitor flow conditions in order to quickly detect deviations from the desired parameters. Here we show how a simple and low-cost sensor design can achieve this, by using machine-learning techniques to distinguishing the characteristic patterns of oblique laser light scattered at the phase interfaces. The sensor is capable of estimating individual phase fluxes (as well as their changes) in multiphase flows and may be applied to safety applications due to its quick response time. (paper)
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Ozkat, Erkan Caner; Franciosa, Pasquale; Ceglarek, Dariusz
2017-08-01
Remote laser welding technology offers opportunities for high production throughput at a competitive cost. However, the remote laser welding process of zinc-coated sheet metal parts in lap joint configuration poses a challenge due to the difference between the melting temperature of the steel (∼1500 °C) and the vapourizing temperature of the zinc (∼907 °C). In fact, the zinc layer at the faying surface is vapourized and the vapour might be trapped within the melting pool leading to weld defects. Various solutions have been proposed to overcome this problem over the years. Among them, laser dimpling has been adopted by manufacturers because of its flexibility and effectiveness along with its cost advantages. In essence, the dimple works as a spacer between the two sheets in lap joint and allows the zinc vapour escape during welding process, thereby preventing weld defects. However, there is a lack of comprehensive characterization of dimpling process for effective implementation in real manufacturing system taking into consideration inherent changes in variability of process parameters. This paper introduces a methodology to develop (i) surrogate model for dimpling process characterization considering multiple-inputs (i.e. key control characteristics) and multiple-outputs (i.e. key performance indicators) system by conducting physical experimentation and using multivariate adaptive regression splines; (ii) process capability space (Cp-Space) based on the developed surrogate model that allows the estimation of a desired process fallout rate in the case of violation of process requirements in the presence of stochastic variation; and, (iii) selection and optimization of the process parameters based on the process capability space. The proposed methodology provides a unique capability to: (i) simulate the effect of process variation as generated by manufacturing process; (ii) model quality requirements with multiple and coupled quality requirements; and (iii
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Chemical mechanical polishing characteristics of ITO thin film prepared by RF magnetron sputtering
International Nuclear Information System (INIS)
Lee, Kang-Yeon; Choi, Gwon-Woo; Kim, Yong-Jae; Choi, Youn-Ok; Kim, Nam-Oh
2012-01-01
Indium-tin-oxide (ITO) thin films have attracted intensive interest because of their unique properties of good conductivity, high optical transmittance over the visible region and easy patterning ability. ITO thin films have found many applications in anti-static coatings, thermal heaters, solar cells, flat panel displays (FPDs), liquid crystal displays (LCDs), electroluminescent devices, sensors and organic light-emitting diodes (OLEDs). ITO thin films are generally fabricated by using various methods, such as spraying, chemical vapor deposition (CVD), evaporation, electron gun deposition, direct current electroplating, high frequency sputtering, and reactive sputtering. In this research, ITO films were grown on glass substrates by using a radio-frequency (RF) magnetron sputtering method. In order to achieve a high transmittance and a low resistivity, we examined the various film deposition conditions, such as substrate temperature, working pressure, annealing temperature, and deposition time. Next, in order to improve the surface quality of the ITO thin films, we performed a chemical mechanical polishing (CMP) with different process parameters and compared the electrical and the optical properties of the polished ITO thin films. The best CMP conditions with a high removal rate, low nonuniformity, low resistivity and high transmittance were as follows: platen speed, head speed, polishing time, and slurry flow rate of 30 rpm, 30 rpm, 60 sec, and 60 ml/min, respectively.
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In situ crystallization of sputter-deposited TiNi by ion irradiation
International Nuclear Information System (INIS)
Ikenaga, Noriaki; Kishi, Yoichi; Yajima, Zenjiro; Sakudo, Noriyuki
2013-01-01
Highlights: ► We developed a sputtering deposition process equipped with an ion irradiation system. ► Ion irradiation enables crystallization at lower substrate temperature. ► Ion fluence has an effective range for low-temperature crystallization. ► Crystallized films made on polyimide by the process show the shape memory effect. -- Abstract: TiNi is well known as a typical shape-memory alloy, and the shape-memory property appears only when the structure is crystalline. Until recently, the material has been formed as amorphous film by single-target sputtering deposition at first and then crystallized by being annealed at high temperature over 500 °C. Therefore, it has been difficult to make crystalline TiNi film directly on a substrate of polymer-based material because of the low heat resistance of substrate. In order to realize an actuator from the crystallized TiNi film on polymer substrates, the substrate temperature should be kept below 200 °C throughout the whole process. In our previous studies we have found that deposited film can be crystallized at very low temperature without annealing but with simultaneous irradiation of Ar ions during sputter-deposition. And we have also demonstrated the shape-memory effect with the TiNi film made by the new process. In order to investigate what parameters of the process contribute to the low-temperature crystallization, we have focused to the ion fluence of the ion irradiation. Resultantly, it was found that the transition from amorphous structure to crystal one has a threshold range of ion fluence
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International Nuclear Information System (INIS)
Kawamura, T.; Ono, T.; Yamamura, Y.
1994-08-01
Physical sputtering yields from the carbon surface irradiated by the boundary plasma are obtained with the use of a Monte Carlo simulation code ACAT. The yields are calculated for many random initial energy and angle values of incident protons or deuterons with a Maxwellian velocity distribution, and then averaged. Here the temperature of the boundary plasma, the sheath potential and the angle δ between the magnetic field line and the surface normal are taken into account. A new fitting formula for an arrangement of the numerical data of sputtering yield is introduced, in which six fitting parameters are determined from the numerical results and listed. These results provide a way to estimate the erosion of carbon materials irradiated by boundary plasma. The particle reflection coefficients for deuterons and their neutrals from a carbon surface are also calculated by the same code and presented together with, for comparison, that for the case of monoenergetic normal incidence. (author)
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Singh, Prashant; Jha, Rajesh Kumar; Singh, Rajat Kumar; Singh, B. R.
2018-02-01
In this paper, we present the structural and electrical properties of the Al2O3 buffer layer on non-volatile memory behavior using Metal/PZT/Al2O3/Silicon structures. Metal/PZT/Silicon and Metal/Al2O3/Silicon structures were also fabricated and characterized to obtain capacitance and leakage current parameters. Lead zirconate titanate (PZT::35:65) and Al2O3 films were deposited by sputtering on the silicon substrate. Memory window, PUND, endurance, breakdown voltage, effective charges, flat-band voltage and leakage current density parameters were measured and the effects of process parameters on the structural and electrical characteristics were investigated. X-ray data show dominant (110) tetragonal phase of the PZT film, which crystallizes at 500 °C. The sputtered Al2O3 film annealed at different temperatures show dominant (312) orientation and amorphous nature at 425 °C. Multiple angle laser ellipsometric analysis reveals the temperature dependence of PZT film refractive index and extinction coefficient. Electrical characterization shows the maximum memory window of 3.9 V and breakdown voltage of 25 V for the Metal/Ferroelectric/Silicon (MFeS) structures annealed at 500 °C. With 10 nm Al2O3 layer in the Metal/Ferroelectric/Insulator/Silicon (MFeIS) structure, the memory window and breakdown voltage was improved to 7.21 and 35 V, respectively. Such structures show high endurance with no significant reduction polarization charge for upto 2.2 × 109 iteration cycles.
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Desorption and ionization processes in laser mass spectrometry
International Nuclear Information System (INIS)
Peyl, G.J.Q. van der.
1984-01-01
In this thesis results are reported from a study on the desorption- and ionization process initiated by infra-red laser irradiation (LDMS) or ion bombardment (SIMS) of thin organic sample layers. The study is especially focused on the formation of quasimolecular ions under these conditions. Results of these investigations can be used for a better optimization of the LDMS and SIMS techniques in organic mass spectrometry. First, an overview is given of laser desorption mass spectrometry. Next, the coupling of the laser energy into the organic sample layer is investigated. It is concluded that the laser energy is primarily absorbed by the substrate material and not by the organic overlayer. The formation of quasi-molecular ions, either in the gas phase or in the substrate surface is investigated. The final section reports kinetic energy distributions for ions sputtered from organic solids and liquids. (Auth.)
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Laser damage studies on MgF2 thin films
International Nuclear Information System (INIS)
Protopapa, Maria Lucia; De Tomasi, Ferdinando; Perrone, Maria Rita; Piegari, Angela; Masetti, Enrico; Ristau, Detlev; Quesnel, Etienne; Duparre, Angela
2001-01-01
The results of laser damage studies performed at 248 nm (KrF excimer laser) on MgF 2 thin films deposited by different techniques (electron-beam evaporation, thermal boat evaporation, and ion-beam sputtering) on fused silica and CaF 2 substrates are presented. We find that the films deposited on CaF 2 substrates by the electron-beam evaporation technique present the highest damage threshold fluence (9 J/cm2). The photoacoustic (PA) beam deflection technique was employed, in addition to microscopical inspection, to determine laser damage fluences. We confirm, by scanning electron microscopy analysis of the damaged spots, the capability of the PA technique to provide information on the mechanisms leading to damage. The dependence of both laser damage fluence and damage morphology on the film deposition technique, as well as on the film substrate, is discussed
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Shape memory effect and microstructures of sputter-deposited Cu-Al-Ni films
International Nuclear Information System (INIS)
Minemura, T.; Andoh, H.; Kita, Y.; Ikuta, I.
1985-01-01
The shape memory effect has been found in many alloy systems which exhibit a thermoelastic martensite transformation. Cu-Al-Ni alloys exhibit an excellent shape memory effect in single crystalline states, but they have not yet been commercially used due to their brittle fracture along the grain boundaries in polycrystalline states. This letter reports the shape memory effect and microstructures of the sputter-deposited Cu-Al-Ni films. Cu-14%Al-4%Ni alloy ingot was prepared. A target for sputter deposition was cut from the ingot. Aluminium foils (20 μm thick) were used for the substrates of sputter deposition. The microstructures and crystal structures of the films were investigated by transmission electron microscopy (TEM) and X-ray diffraction using CuKα radiation, respectively. The effect of the sputtering conditions such as substrate temperature, partial pressure of argon gas, and the sputtering power on the structures of sputter-deposited Cu-14%Al-4%Ni films were investigated by X-ray diffraction. Results are shown and discussed. Photographs demonstrate shape memory behaviour of Cu-14%Al-4%Ni films sputter-deposited on aluminium foils from (a) liquid nitrogen temperature to (d) room temperature. (author)
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Spatial distributions of Cu polycrystal sputtered atoms
International Nuclear Information System (INIS)
Abgaryan, V.K.; Semenov, A.A.; Shkarban, I.I.
2004-01-01
The results of the experimental determination of the Cu atoms spatial distribution, sputtered from the polycrystalline copper target, irradiated by the Xe + ions with the energy of 300 eV, are presented. The spatial distributions of the sputtered particles, calculated through the quasistable-dynamic model of the cascade modeling (CAMO) are presented also for the case of the polycrystalline copper irradiation by the Ar + and Xe + ions with the energy of 300-1000 eV [ru
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Sputtering of sodium on the planet Mercury
Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.
1986-01-01
It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.
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Sathiya, P.; Panneerselvam, K.; Soundararajan, R.
2012-09-01
Laser welding input parameters play a very significant role in determining the quality of a weld joint. The joint quality can be defined in terms of properties such as weld bead geometry, mechanical properties and distortion. Therefore, mechanical properties should be controlled to obtain good welded joints. In this study, the weld bead geometry such as depth of penetration (DP), bead width (BW) and tensile strength (TS) of the laser welded butt joints made of AISI 904L super austenitic stainless steel were investigated. Full factorial design was used to carry out the experimental design. Artificial Neural networks (ANN) program was developed in MatLab software to establish the relationships between the laser welding input parameters like beam power, travel speed and focal position and the three responses DP, BW and TS in three different shielding gases (Argon, Helium and Nitrogen). The established models were used for optimizing the process parameters using Genetic Algorithm (GA). Optimum solutions for the three different gases and their respective responses were obtained. Confirmation experiment has also been conducted to validate the optimized parameters obtained from GA.
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Proton sputtering. Final report
International Nuclear Information System (INIS)
Finfgeld, C.R.
1975-01-01
This research provides sputtering yields as a function of energy for H + and D + on several representative pure metallic elements, in the absence of surface contaminants. The experimental technique and apparatus are described. Data are given for Au, Co, Ta, W, and Mo
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Sputtered tin oxide and titanium oxide thin films as alternative transparent conductive oxides
Energy Technology Data Exchange (ETDEWEB)
Boltz, Janika
2011-12-12
Alternative transparent conductive oxides to tin doped indium oxide have been investigated. In this work, antimony doped tin oxide and niobium doped titanium oxide have been studied with the aim to prepare transparent and conductive films. Antimony doped tin oxide and niobium doped titanium oxide belong to different groups of oxides; tin oxide is a soft oxide, while titanium oxide is a hard oxide. Both oxides are isolating materials, in case the stoichiometry is SnO{sub 2} and TiO{sub 2}. In order to achieve transparent and conductive films free carriers have to be generated by oxygen vacancies, by metal ions at interstitial positions in the crystal lattice or by cation doping with Sb or Nb, respectively. Antimony doped tin oxide and niobium doped titanium oxide films have been prepared by reactive direct current magnetron sputtering (dc MS) from metallic targets. The process parameters and the doping concentration in the films have been varied. The films have been electrically, optically and structurally analysed in order to analyse the influence of the process parameters and the doping concentration on the film properties. Post-deposition treatments of the films have been performed in order to improve the film properties. For the deposition of transparent and conductive tin oxide, the dominant parameter during the deposition is the oxygen content in the sputtering gas. The Sb incorporation as doping atoms has a minor influence on the electrical, optical and structural properties. Within a narrow oxygen content in the sputtering gas highly transparent and conductive tin oxide films have been prepared. In this study, the lowest resistivity in the as deposited state is 2.9 m{omega} cm for undoped tin oxide without any postdeposition treatment. The minimum resistivity is related to a transition to crystalline films with the stoichiometry of SnO{sub 2}. At higher oxygen content the films turn out to have a higher resistivity due to an oxygen excess. After post
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Laser post-ionization secondary neutral mass spectroscopy
International Nuclear Information System (INIS)
Gruen, D.M.; Pellin, M.J.; Calaway, W.F.; Young, C.E.
1987-01-01
Three different instruments using laser ionization techniques will be described. Results from the SARISA instrument with a demonstrated figure of merit of .05 (atoms detected/atoms sputtered) for resonance ionization; detection of Fe at the sub-part-per-billion level in ultrapure Si; and features of the instrument such as energy and angle refocusing time-of-flight (EARTOF) mass spectrometer and multiplexing for simultaneous detection of secondary ions and neutrals. 12 refs., 3 figs
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Study of the ion sputter-machining, 1
International Nuclear Information System (INIS)
Miyamoto, Iwao; Taniguchi, Norio
1979-01-01
A lattice disordering of the surface of single crystal silicon due to ion bombardment of Ar + was investigated by the high energy electron diffraction method, with the incident angle of 1.7 0 and 2.8 0 . By this measuring system, the degree of disorders of the sputter-machined surface layer of Si single crystal in the depth of 50 A and 30 A has been determined, under the working conditions of the ion energy ranging from 0.2 keV to 1.5 keV and the incident angle of ion ranging from 0 0 to 75 0 . Moreover, the recovery of lattice disorder of sputter-machined surface layer of Si single crystal by means of the isochronal thermal annealing has been also confirmed by the same method. From the above experiments, the following conclusions are obtained. (1) The layers of sputter-machined surface of Si single crystal workpiece are highly disordered like amorphous, under the working conditions of ion energy ranging from 0.2 keV to 1.5 keV for the vertical ion incident angle. (2) Under the working conditions of ion incident angle larger than 60 0 , using the ion beam with a lower energy under 300 eV, the surface of the workpiece is not disordered. Therefore, a sputter-machined surface of Si single crystal with highly ordered structure can be obtained under this working condition. (3) The recovery of disorder of sputter-machined surface is completed by the heat-treatment of workpiece under isochronal annealing for 1 hour at 800 0 C. However, it is not clear whether this recovery of lattice point or the dispersion of interstitially located argon atoms from the surface to the outside. (author)
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Sputtering yield calculation for binary target
International Nuclear Information System (INIS)
Jimenez-Rodriguez, J.J.; Rodriguez-Vidal, M.; Valles-Abarca, J.A.
1979-01-01
The generalization for binary targets, of the ideas proposed by Sigmund for monoatomic targets, leads to a set of coupled intergrodifferential equations for the sputtering functions. After moment decomposition, the final formulae are obtained by the standard method based on the Laplace Transform, where the inverse transform is made with the aid of asymptotic expansions in the limit of very high projectile energy as compared to the surface binding energy. The possible loss of stoichiometry for binary targets is analyzed. Comparison of computed values of sputtering yield for normal incidence, with experimental results shows good agreement. (author)
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Photonometers for coating and sputtering machines
Directory of Open Access Journals (Sweden)
Václavík J.
2013-05-01
Full Text Available The concept of photonometers (alternative name of optical monitor of a vacuum deposition process for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.
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Low-dose effects in the sputtering of evaporated films
Energy Technology Data Exchange (ETDEWEB)
Florio, A.R.O.; Alonso, E.V.; Baragiola, R.A.; Ferron, J. (Comision Nacional de Energia Atomica, San Carlos de Bariloche (Argentina). Centro Atomico Bariloche)
1983-05-01
We report measurements of the dose dependence of the sputtering of evaporated films by 30 keV ions under UHV. An initial (sub-monolayer) enhanced sputtering is attributed to the removal of weakly bound atoms; this enhancement does not depend on the incidence angle of the projectile.
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Sputtering of solid nitrogen by keV helium ions
DEFF Research Database (Denmark)
Ellegaard, O.; Schou, Jørgen; Sørensen, H.
1993-01-01
Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...
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International Nuclear Information System (INIS)
Xu, S.C.; Yang, C.; Liu, M.; Jiang, S.Z.; Ma, Y.Y.; Chen, C.S.; Gao, X.G.; Sun, Z.C.; Hu, B.; Wang, C.C.; Man, B.Y.
2012-01-01
High quality β-FeSi 2 thin films have been fabricated on silicon (100) substrate by the pulsed laser deposition (PLD) technique with the Fe and sintered FeSi 2 targets. The crystalline quality and surface morphology of the samples were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy. These results indicate that the samples prepared with a Fe target can acquire a better crystalline quality and a smoother surface than those with a sintered FeSi 2 target. The reasons were discussed with subsurface superheating mechanism. The intrinsic PL spectrum attributed to the interband transition of β-FeSi 2 for all the samples was compared, showing that the film prepared with Fe target can acquire a good PL property by optimizing experimental parameters. It is suggested that sputtering Fe on Si substrate by the pulsed laser offers a cheap and convenient way to prepare the β-FeSi 2 thin films. -- Highlights: ► β-FeSi 2 films were fabricated by PLD technique with the Fe and FeSi 2 targets. ► The films prepared with Fe target have good crystalline quality and smooth surface. ► The Fe target prepared film acquired a high PL intensity. ► Sputtering Fe on Si substrate offers a convenient way to prepare the β-FeSi 2 films.
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Laser damage study of material of the first wall of target chamber of the future laser Megajoule
International Nuclear Information System (INIS)
Dubern, Christelle
1999-01-01
Study on damage of carbon-like, boron carbide, and stainless steel materials by ultraviolet laser light, has been carried out at CEA/CESTA in France. This work was performed to help designing and dimensioning the target chamber of the future Laser MegaJoule (LMJ) facility to be used for Inertial Confinement Fusion research. The study revealed that depending the laser fluence, the considered materials were ablated in different manners. lt was demonstrated that at low fluence, damage of carbon-like and boron carbide occurs through a thermal-mechanical mechanism resulting in sputtering of material. At higher fluence, damage was driven by a thermal mechanism, dissipating heat inside material until phase change developed. For stainless steel material, failures were the result of heat absorption associated to physical changes only. To explain and validate the proposed mechanisms, theoretical and experimental works were performed and satisfactory results came out. (author) [fr
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Piezoelectric Response Evaluation of ZnO Thin Film Prepared by RF Magnetron Sputtering
Directory of Open Access Journals (Sweden)
Cheng Da-Long
2017-01-01
Full Text Available The most important parameter of piezoelectric materials is piezoelectric coefficient (d33. In this study, the piezoelectric ZnO thin films were deposited on the SiNx/Si substrate. The 4 inches substrate is diced into 8 cm× 8 cm piece. During the deposition process, a zinc target (99.999 wt% of 2 inches diameter was used. The vertical distance between the target and the substrate holder was fixed at 5 cm. The piezoelectric response of zinc oxide (ZnO thin films were obtained by using a direct measurement system. The system adopts a mini impact tip to generate an impulsive force and read out the piezoelectric signals immediately. Experimentally, a servo motor is used to produce a fixed quantity of force, for giving an impact against to the piezoelectric film. The ZnO thin films were deposited using the reactive radio frequency (RF magnetron sputtering method. The electric charges should be generated because of the material’s extrusion. This phenomenon was investigated through the oscilloscope by one shot trigger. It was apparent that all ZnO films exhibit piezoelectric responses evaluated by our measurement system, however, its exhibit a significant discrepancy. The piezoelectric responses of ZnO thin film at various deposition positions were measured and the crystal structures of the sputtering pressure were also discussed. The crystalline characteristics of ZnO thin films are investigated through the XRD and SEM. The results show the ZnO thin film exhibits good crystalline pattern and surface morphology with controlled sputtering condition. The ZnO thin films sputtered using 2 inches target present various piezoelectric responses. With the exactly related position, a best piezoelectric response of ZnO thin film can be achieved.
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Composition changes in sputter deposition of Y-Ba-Cu-O films
International Nuclear Information System (INIS)
Hoshi, Y.; Naoe, M.
1989-01-01
The authors discuss the mechanism of the composition change in sputter deposition of Y-BA-Cu-O film from YBa 2 Cu 3 O 7-chi target investigated by means of a rf planar magnetron sputtering apparatus. Film composition changes significantly with not only substrate temperature Ts and sputtering gas pressure, but also substrate position. Lack of Cu and Ba content is significant in the film deposited at the substrate position just above the erosion area of the sputtering target. Suppression of bombardment of the substrate surface by negative ions emitted from the target and substrate is effective in increasing Cu and Ba content in the film. These results indicate not only that the sticking probability of the sputtered particles changes with Ts and incident particle energy, but also that high energy particle bombardment of the substrate surface plays an important role in the change of the film composition
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Directory of Open Access Journals (Sweden)
Sin-Liang Ou
2016-01-01
Full Text Available The off-axis sputtering technique was used to deposit Al-doped ZnO (AZO films on glass substrates at room temperature. For the illustration of the sample position in the sputtering chamber, the value of R/r is introduced. Here, r is the radius of AZO target and R is the distance between the sample and the center of substrate holder. A systematic study for the effect of deposition parameters on structural, optical, and electrical properties of AZO films has been investigated in detail. As the sample position of R/r is fixed at 1.8, it is found that the as-deposited AZO film has relatively low resistivity of 2.67 × 10−3 Ω-cm and high transmittance above 80% in the visible region. Additionally, after rapid thermal annealing (RTA at 600°C with N2 atmosphere, the resistivity of this AZO film can be further reduced to 1.19 × 10−3 Ω-cm. This indicates the AZO films prepared by off-axis magnetron sputtering and treated via the appropriate RTA process have great potential in optoelectronic applications.
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Directory of Open Access Journals (Sweden)
Claudiu V. Falub
2017-05-01
Full Text Available Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system. A typical multilayer consists of a bilayer stack up to 50 periods, with alternating (50-100 nm thick magnetic layers and (2-20 nm thick dielectric interlayers. We introduced the in-plane magnetic anisotropy in these films during sputtering by a combination of a linear magnetic field, seed layer texturing by means of linear collimators, and the oblique incidence inherent to the geometry of the sputter system. Depending on the magnetic material, the anisotropy field for these films was tuned in the range of ∼(7-120 Oe by choosing the appropriate interlayer thickness, the aspect ratios of the linear collimators in front of the targets, and the sputter process parameters (e.g. pressure, power, DC pulse frequency, while the coercivity was kept low, ∼(0.05-0.9 Oe. The alignment of the easy axis (EA on the 8” wafers was typically between ±1.5° and ±4°. We discuss the interdependence of structure and magnetic properties in these films, as revealed by atomic force microscopy (AFM, X-ray reflectivity (XRR with reciprocal space mapping (RSM and magneto-optical Kerr effect (MOKE measurements.
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Energy Technology Data Exchange (ETDEWEB)
Azanza Ricardo, C.L., E-mail: Cristy.Azanza@ing.unitn.it [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Pastorelli, M.; D' Incau, M. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Aswath, P. [College of Engineering, University of Texas at Arlington, TX (United States); Scardi, P. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy)
2016-04-30
Aluminum doped Zinc Oxide thin films were deposited on standard soda-lime substrates by reactive radio frequency magnetron sputtering. Residual stress and texture were studied by X-ray diffraction, while X-ray Absorption Near Edge Spectroscopy provided information on the Al environment in the best performing thin films. The influence of deposition parameters on structural and microstructural properties is discussed. A correlation between microstructure and residual stress state with electrical and optical properties is proposed. - Highlights: • Al doped ZnO thin films were obtained by reactive radio frequency magnetron sputtering. • Correlation of stresses and texture with electrical and optical properties is shown. • Homogeneous and stress-free thin-films are the best performing ones. • XANES confirmed the doping mechanism and excluded some spurious phases.
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DEFF Research Database (Denmark)
Crovetto, Andrea; Ottsen, Tobias Sand; Stamate, Eugen
2016-01-01
-pressure regime, we find a generalized dependence of the electrical properties, grain size, texture, and Al content on compressive stress, regardless of sputtering pressure or position on the substrate. In a high-pressure regime, a porous microstructure limits the achievable resistivity and causes it to increase......The electrical properties of RF-sputtered Al-doped ZnO are often spatially inhomogeneous and strongly dependent on deposition parameters. In this work, we study the mechanisms that limit the minimum resistivity achievable under different deposition regimes. In a low- and intermediate...... over time as well. The primary cause of inhomogeneity in the electrical properties is identified as energetic particle bombardment. Inhomogeneity in oxygen content is also observed, but its effect on the electrical properties is small and limited to the carrier mobility....
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Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition
Energy Technology Data Exchange (ETDEWEB)
Kim, Yonggi; Kim, Bomsok; Lee, Jaesang [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)
2013-05-15
Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances.
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Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition
International Nuclear Information System (INIS)
Kim, Yonggi; Kim, Bomsok; Lee, Jaesang
2013-01-01
Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances
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Energy Technology Data Exchange (ETDEWEB)
Bajric, Sendin [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
2017-06-12
Additive manufacturing needs a broader selection of materials for part production. In order for the Los Alamos National Laboratory (LANL) to investigate new materials for selective laser sintering (SLS), this paper reviews research on the effect of print parameters on part density, accuracy, and surface roughness of polyamide 12 (PA12, PA2200). The literature review serves to enhance the understanding of how changing the laser powder, scan speed, etc. will affect the mechanical properties of a commercial powder. By doing so, this understanding will help the investigation of new materials for SLS.
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Physicochemical model for reactive sputtering of hot target
Energy Technology Data Exchange (ETDEWEB)
Shapovalov, Viktor I., E-mail: vishapovalov@mail.ru; Karzin, Vitaliy V.; Bondarenko, Anastasia S.
2017-02-05
A physicochemical model for reactive magnetron sputtering of a metal target is described in this paper. The target temperature in the model is defined as a function of the ion current density. Synthesis of the coating occurs due to the surface chemical reaction. The law of mass action, the Langmuir isotherm and the Arrhenius equation for non-isothermal conditions were used for mathematical description of the reaction. The model takes into consideration thermal electron emission and evaporation of the target surface. The system of eight algebraic equations, describing the model, was solved for the tantalum target sputtered in the oxygen environment. It was established that the hysteresis effect disappears with the increase of the ion current density. - Highlights: • When model is applied for a cold target, hysteresis width is proportional to the ion current density. • Two types of processes of hot target sputtering are possible, depending on the current density: with and without the hysteresis. • Sputtering process is dominant at current densities less than 50 A/m{sup 2} and evaporation can be neglected. • For current densities over 50 A/m{sup 2} the hysteresis width reaches its maximum and the role of evaporation increases.
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Energy Technology Data Exchange (ETDEWEB)
Li, Bao-jia, E-mail: li_bjia@126.com [School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013 (China); Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); Huang, Li-jing [School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013 (China); Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); Ren, Nai-fei [Jiangsu Provincial Key Laboratory of Center for Photon Manufacturing Science and Technology, Jiangsu University, Zhenjiang 212013 (China); School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013 (China); Kong, Xia; Cai, Yun-long; Zhang, Jie-lu [Jiangsu Tailong Reduction Box Co. Ltd., Taixing 225400 (China)
2015-10-01
Highlights: • Ni/FTO films were prepared by sputtering Ni layers on commercial FTO glass. • The as-prepared Ni/FTO films underwent magnetic-field-assisted laser annealing. • Magnetic field and laser fluence were crucial for improving quality of the films. • All Ni/FTO films displayed enhanced compactness after magnetic laser annealing. • Magnetic laser annealing using a fluence of 0.9 J/cm{sup 2} led to the best film quality. - Abstract: Nickel-coated fluorine-doped tin oxide (Ni/FTO) thin films were prepared by sputtering Ni layers on commercial FTO glass. The as-prepared Ni/FTO films underwent nanosecond pulsed laser annealing in an external magnetic field (0.4 T). The effects of the presence of magnetic field and laser fluence on surface morphology, crystal structure and photoelectric properties of the films were investigated. All the films displayed enhanced compactness after magnetic-field-assisted laser annealing. It was notable that both crystallinity and grain size of the films gradually increased with increasing laser fluence from 0.6 to 0.9 J/cm{sup 2}, and then decreased slightly with an increase in laser fluence to 1.1 J/cm{sup 2}. As a result, the film obtained by magnetic-field-assisted laser annealing using a fluence of 0.9 J/cm{sup 2} had the best overall photoelectric property with an average transmittance of 81.2%, a sheet resistance of 5.5 Ω/sq and a figure of merit of 2.27 × 10{sup −2} Ω{sup −1}, outperforming that of the film obtained by pure laser annealing using the same fluence.
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Low-dose effects in the sputtering of evaporated films
International Nuclear Information System (INIS)
Florio, A.R.O.; Alonso, E.V.; Baragiola, R.A.; Ferron, J.
1983-01-01
We report measurements of the dose dependence of the sputtering of evaporated films by 30 keV ions under UHV. An initial (sub-monolayer) enhanced sputtering is attributed to the removal of weakly bound atoms; this enhancement does not depend on the incidence angle of the projectile. (author)
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Depth of origin of atoms sputtered from crystalline targets
International Nuclear Information System (INIS)
Shapiro, M.H.; Trovato, E.; Tombrello, T.A.
2001-01-01
Recently, V.I. Shulga and W. Eckstein (Nucl. Instr. and Meth. B 145 (1998) 492) investigated the depth of origin of atoms sputtered from random elemental targets using the Monte Carlo code TRIM.SP and the lattice code OKSANA. They found that the mean depth of origin is proportional to N -0.86 , where N is the atomic density; and that the most probable escape depth is ∼λ 0 /2, where λ 0 is the mean atomic distance. Since earlier molecular dynamics simulations with small crystalline elemental targets typically produced a most probable escape depth of zero (i.e., most sputtered atoms came from the topmost layer of the target), we have carried out new molecular dynamics simulations of sputtered atom escape depths with much larger crystalline targets. Our new results, which include the bcc targets Cs, Rb and W, as well as the fcc targets Cu and Au predict that the majority of sputtered atoms come from the first atomic layer for the bcc(1 0 0), bcc(1 1 1), fcc(1 0 0) and fcc(1 1 1) targets studied. For the high-atomic density targets Cu, Au and W, the mean depth of origin of sputtered atoms typically is less than 0.25λ 0 . For the low-atomic density targets Cs and Rb, the mean depth of origin of sputtered atoms is considerably larger, and depends strongly on the crystal orientation. We show that the discrepancy between the single-crystal and amorphous target depth of origin values can be resolved by applying a simple correction to the single-crystal results
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Effect of process parameters on formability of laser melting deposited 12CrNi2 alloy steel
Peng, Qian; Dong, Shiyun; Kang, Xueliang; Yan, Shixing; Men, Ping
2018-03-01
As a new rapid prototyping technology, the laser melting deposition technology not only has the advantages of fast forming, high efficiency, but also free control in the design and production chain. Therefore, it has drawn extensive attention from community.With the continuous improvement of steel performance requirements, high performance low-carbon alloy steel is gradually integrated into high-tech fields such as aerospace, high-speed train and armored equipment.However, it is necessary to further explore and optimize the difficult process of laser melting deposited alloy steel parts to achieve the performance and shape control.This article took the orthogonal experiment on alloy steel powder by laser melting deposition ,and revealed the influence rule of the laser power, scanning speed, powder gas flow on the quality of the sample than the dilution rate, surface morphology and microstructure analysis were carried out.Finally, under the optimum technological parameters, the Excellent surface quality of the alloy steel forming part with high density, no pore and cracks was obtained.
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International Nuclear Information System (INIS)
Singh, Akash; Kuppusami, P.; Thirumurugesan, R.; Mohandas, E.; Geetha, M.; Kamaraj, V.; Kumar, Niranjan
2010-01-01
In the present work wear behaviour of ZrN films grown by a pulsed direct current magnetron sputtering method is reported. The films were grown on silicon (100) and titanium modified stainless steel (alloy-D9) substrates by reactive sputtering in a mixture of argon and nitrogen gases. The structural parameters, preferred orientation and crystallite size as a function of substrate temperatures in the range 300-873 K were studied using X-Ray Diffraction. Deposition parameters have been found to influence the growth rate, crystalline structure and surface roughness, which affect the tribological behaviour of the films. A comparative wear study was performed on these substrates with steel and ceramic balls to evaluate the frictional properties of films. The best tribological performance was found for the sample grown with low flow rates of nitrogen (≤ 2 SCCM) at 873K. The coefficient of friction was found to be lower for the films deposited at higher temperature using steel and ceramic balls. This behaviour was correlated with microstructure and deformation behaviour of coatings. (author)
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Alnussirat, S. T.; Barghouty, A. F.; Edmunson, J. E.; Sabra, M. S.; Rickman, D. L.
2018-04-01
Sputtering of lunar regolith by solar-wind protons and heavy ions with kinetic energies of about 1 keV/amu is an important erosive process that affects the lunar surface and exosphere. It plays an important role in changing the chemical composition and thickness of the surface layer, and in introducing material into the exosphere. Kinetic sputtering is well modeled and understood, but understanding of mechanisms of potential sputtering has lagged behind. In this study we differentiate the contributions of potential sputtering from the standard (kinetic) sputtering in changing the chemical composition and erosion rate of the lunar surface. Also we study the contribution of potential sputtering in developing the lunar exosphere. Our results show that potential sputtering enhances the total characteristic sputtering erosion rate by about 44%, and reduces sputtering time scales by the same amount. Potential sputtering also introduces more material into the lunar exosphere.
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Miyamoto, Yu; Fujii, Yuma; Yamano, Masafumi; Harigai, Toru; Suda, Yoshiyuki; Takikawa, Hirofumi; Nishiuchi, Mamiko; Sakaki, Hironao; Kondo, Kiminori
2015-09-01
Free-standing thin films such as diamond-like carbon (DLC) and gold (Au) have been attracted increasing interests as film targets used in the laser-driven ion acceleration experiment. One of the methods to make the free-standing thin film is to use a soluble sacrifice layer. In this study, the fabrication technique of self-standing Au thin film is presented. Gelatin, oblate, silk fibroin, and NaCl were examined as a. Au thin films were deposited by DC plasma sputtering on sacrifice layers. The gelatin and oblate were used as the sacrificial layer and the supporting substrate. Silk fibroin was coated on glass substrates by a spin coater. The NaCl sacrificial layers were deposited on flat Si substrates by the vacuum vapor deposition system. Sputtered Au thin films were released by immersing the substrates in purified water. Self-standing Au thin films were fabricated by scooping up the released Au thin film on a perforated substrate. The highest quality of the self-standing Au thin film was achieved by using NaCl sacrificial layer. This work was supported by JSPS KAKENHI Grant-in-Aid for Scientific Research and Toukai Foundation for Technology.
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Study of the chemical sputtering in Tore-Supra
International Nuclear Information System (INIS)
Cambe, A.
2002-01-01
The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C 2 D x and C 3 D y ) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD 4 (Y CD4 ) is highly flux (φ) dependent, showing a variation of the form: Y CD4 ∝ φ -0.23 . The experimental study also reveals that an increase of the surface temperature induces an augmentation of Y CD4 . The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, μm wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 μm of tungsten. (author)
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Sputtering of Ge(001): transition between dynamic scaling regimes
DEFF Research Database (Denmark)
Smilgies, D.-M.; Eng, P.J.; Landemark, E.
1997-01-01
We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...
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Nitinol: Tubing versus sputtered film - microcleanliness and corrosion behavior.
Wohlschlögel, Markus; Lima de Miranda, Rodrigo; Schüßler, Andreas; Quandt, Eckhard
2016-08-01
Corrosion behavior and microcleanliness of medical-device grade Nitinol tubing (Nix Ti1- x , x = 0.51; outer diameter 7 mm, wall thickness 0.5 mm), drawn from various ingot qualities, are compared to the characteristics of sputtered Nitinol film material (Nix Ti1- x , x = 0.51; thickness 50 µm). Electropolished tubing half-shell samples are tested versus as-received sputtered film samples. Inclusion size distributions are assessed using quantitative metallography and corrosion behavior is investigated by potentiodynamic polarization testing in phosphate-buffered saline at body temperature. For the sputtered film samples, the surface chemistry is additionally analyzed employing Auger Electron Spectroscopy (AES) composition-depth profiling. Results show that the fraction of breakdowns in the potentiodynamic polarization test correlates with number and size of the inclusions in the material. For the sputtered Nitinol film material no inclusions were detectable by light microscopy on the one hand and no breakdowns were found in the potentiodynamic polarization test on the other hand. As for electropolished Nitinol, the sputtered Nitinol film material reveals Nickel depletion and an Oxygen-to-Titanium intensity ratio of ∼2:1 in the surface oxide layer, as measured by AES. © 2015 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 104B: 1176-1181, 2016. © 2015 Wiley Periodicals, Inc.
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Time-dependent angular distribution of sputtered particles from amorphous targets
International Nuclear Information System (INIS)
Yamamura, Yasunori
1990-01-01
Using the time-evolution computer simulation code DYACAT, the time-dependent behavior of sputtering phenomena has been investigated. The DYACAT program is based on the binary collision approximation, and the cascade development in solids is followed time-evolutionally. The total sputtering yield, the angular distribution and the energy distribution of sputtered atoms are calculated as a function of time for 1 keV Ar→Cu, where the angle of incidence is the inverse surface normal. It is found that the angular distribution of the prompt collisional phase of the sputtering process shows an under-cosine and that the corresponding energy spectrum has a peak near 10 eV. The slow collisional phase of 1 keV Ar→Cu will start after 3x10 -14 s, and its angular distribution shows an over-cosine distribution. (orig.)
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Epitaxial growth of rhenium with sputtering
Energy Technology Data Exchange (ETDEWEB)
Oh, Seongshik [National Institute of Standards and Technology, Boulder, CO 80305 (United States) and Department of Physics, University of Illinois, Urbana, IL 61801 (United States)]. E-mail: soh@boulder.nist.gov; Hite, Dustin A. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Cicak, K. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Osborn, Kevin D. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Simmonds, Raymond W. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); McDermott, Robert [University of California, Santa Barbara, CA 93106 (United States); Cooper, Ken B. [University of California, Santa Barbara, CA 93106 (United States); Steffen, Matthias [University of California, Santa Barbara, CA 93106 (United States); Martinis, John M. [University of California, Santa Barbara, CA 93106 (United States); Pappas, David P. [National Institute of Standards and Technology, Boulder, CO 80305 (United States)
2006-02-21
We have grown epitaxial Rhenium (Re) (0001) films on {alpha}-Al{sub 2}O{sub 3} (0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 deg. C and deposition rates below 0.1 nm/s. The epitaxial Re films are typically composed of terraced hexagonal islands with screw dislocations, and island size gets larger with high temperature post-deposition annealing. The growth starts in a three dimensional mode but transforms into two dimensional mode as the film gets thicker. With a thin ({approx}2 nm) seed layer deposited at room temperature and annealed at a high temperature, the initial three dimensional growth can be suppressed. This results in larger islands when a thick film is grown at 850 deg. C on the seed layer. We also find that when a room temperature deposited Re film is annealed to higher temperatures, epitaxial features start to show up above {approx}600 deg. C, but the film tends to be disordered.
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Ion source with radiofrequency mass filter for sputtering purposes
International Nuclear Information System (INIS)
Sielanko, J.; Sowa, M.
1990-01-01
The Kaufman ion source with radiofrequency mass filter is described. The construction as well as operating characteristics of ion source are presented. The arrangement is suitable for range distribution measurements of implanted layers, where the sputtering rate has to be constant over the wide range of sputtering time. 4 figs., 17 refs. (author)
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Kobayashi, Shinji; Nishimiya, Nobuo; Suzuki, Masao
2017-10-01
The saturated absorption lines of neutral titanium were measured in the region of 9950-14380 cm-1 using a Ti:sapphire ring laser. A facing target sputtering system was used to obtain the gaseous state of a Ti I atom. The Zeeman splitting of 38 transitions was observed under the condition that the electric field component of a linearly polarized laser beam was parallel to the magnetic field. The gJ factors of the odd parity states were determined for 28 states belonging to 3d24s4p and 3d34p using those of the even parity states reported by Stachowska in 1997. The gJ factors of z5P1,2,3 levels were newly determined. gJ of y3F2, y3D2, z3P2, and z5S2 levels were refined.
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Energy Technology Data Exchange (ETDEWEB)
Ambwani, P.; Xu, P.; Jeong, J. S.; Deng, R.; Mkhoyan, K. A.; Jalan, B.; Leighton, C., E-mail: leighton@umn.edu [Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455 (United States); Haugstad, G. [Characterization Facility, University of Minnesota, Minneapolis, Minnesota 55455 (United States)
2016-08-07
SrTiO{sub 3} is not only of enduring interest due to its unique dielectric, structural, and lattice dynamical properties, but is also the archetypal perovskite oxide semiconductor and a foundational material in oxide heterostructures and electronics. This has naturally focused attention on growth, stoichiometry, and defects in SrTiO{sub 3}, one exciting recent development being such precisely stoichiometric defect-managed thin films that electron mobilities have finally exceeded bulk crystals. This has been achieved only by molecular beam epitaxy, however (and to a somewhat lesser extent pulsed laser deposition (PLD)), and numerous open questions remain. Here, we present a study of the stoichiometry, defects, and structure in SrTiO{sub 3} synthesized by a different method, high pressure oxygen sputtering, relating the results to electronic transport. We find that this form of sputter deposition is also capable of homoepitaxy of precisely stoichiometric SrTiO{sub 3}, but only provided that substrate and target preparation, temperature, pressure, and deposition rate are carefully controlled. Even under these conditions, oxygen-vacancy-doped heteroepitaxial SrTiO{sub 3} films are found to have carrier density, mobility, and conductivity significantly lower than bulk. While surface depletion plays a role, it is argued from particle-induced X-ray emission (PIXE) measurements of trace impurities in commercial sputtering targets that this is also due to deep acceptors such as Fe at 100's of parts-per-million levels. Comparisons of PIXE from SrTiO{sub 3} crystals and polycrystalline targets are shown to be of general interest, with clear implications for sputter and PLD deposition of this important material.
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Non-conventional photocathodes based on Cu thin films deposited on Y substrate by sputtering
Energy Technology Data Exchange (ETDEWEB)
Perrone, A. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); National Institute of Nuclear Physics and University of Salento, 73100 Lecce (Italy); D’Elia, M. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); Gontad, F., E-mail: francisco.gontad@le.infn.it [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); National Institute of Nuclear Physics and University of Salento, 73100 Lecce (Italy); Di Giulio, M.; Maruccio, G. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); Cola, A. [National Council Research, Institute for Microelectronics and Microsystems, 73100 Lecce (Italy); Stankova, N.E. [Institute of Electronics, Bulgarian Academy of Sciences, 1784 Sofia (Bulgaria); Kovacheva, D.G. [Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, 1113 Sofia (Bulgaria); Broitman, E. [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)
2014-07-01
Copper (Cu) thin films were deposited on yttrium (Y) substrate by sputtering. During the deposition, a small central area of the Y substrate was shielded to avoid the film deposition and was successively used to study its photoemissive properties. This configuration has two advantages: the cathode presents (i) the quantum efficiency and the work function of Y and (ii) high electrical compatibility when inserted into the conventional radio-frequency gun built with Cu bulk. The photocathode was investigated by scanning electron microscopy to determine surface morphology. X-ray diffraction and atomic force microscopy studies were performed to compare the structure and surface properties of the deposited film. The measured electrical resistivity value of the Cu film was similar to that of high purity Cu bulk. Film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Finally, the photoelectron performance in terms of quantum efficiency was obtained in a high vacuum photodiode cell before and after laser cleaning procedures. A comparison with the results obtained with a twin sample prepared by pulsed laser deposition is presented and discussed.
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Development of an inductively coupled impulse sputtering source for coating deposition
Loch, Daniel Alexander Llewellyn
In recent years, highly ionised pulsed plasma processes have had a great impact on improving the coating performance of various applications, such as for cutting tools and ITO coatings, allowing for a longer service life and improved defect densities. These improvements stem from the higher ionisation degree of the sputtered material in these processes and with this the possibility of controlling the flux of sputtered material, allowing the regulation of the hardness and density of coatings and the ability to sputter onto complex contoured substrates. The development of Inductively Coupled Impulse Sputtering (ICIS) is aimed at the potential of utilising the advantages of highly ionised plasma for the sputtering of ferromagnetic material. In traditional magnetron based sputter processes ferromagnetic materials would shunt the magnetic field of the magnetron, thus reducing the sputter yield and ionisation efficiency. By generating the plasma within a high power pulsed radio frequency (RF) driven coil in front of the cathode, it is possible to remove the need for a magnetron by applying a high voltage pulsed direct current to the cathode attracting argon ions from the plasma to initiate sputtering. This is the first time that ICIS technology has been deployed in a sputter coating system. To study the characteristics of ICIS, current and voltage waveforms have been measured to examine the effect of increasing RF-power. Plasma analysis has been conducted by optical emission spectroscopy to investigate the excitation mechanisms and the emission intensity. These are correlated to the set RF-power by modelling assumptions based on electron collisions. Mass spectroscopy is used to measure the plasma potential and ion energy distribution function. Pure copper, titanium and nickel coatings have been deposited on silicon with high aspect ratio via to measure the deposition rate and characterise the microstructure. For titanium and nickel the emission modelling results are in
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Directory of Open Access Journals (Sweden)
Krawczak Ewelina
2017-01-01
Full Text Available The use of aluminum contacts is common in the process of silicon solar cells production because of low contact resistivity. It has also a great importance in thin film technology for photovoltaics, especially in copper-indium-gallium-diselenide (CIGS devices. The final stage of CIGS cell production is the top contact deposition of high conductivity layer for lateral current collection. Such material has to be highly optically transparent as well. In order to make a contact, metal is deposited onto TCO layer with minimum shadowing to allow as much light as possible into device. The metal grid contact is being made by deposition of few microns of aluminum. The resistivity of the deposited material as well as resistance between the metal grid and TCO layer plays a great role in high quality solar cell production. This paper presents the results of four point probe conductivity analysis of Al thin films deposited by direct current (DC magnetron sputtering method. Influence of technological parameters of the Al deposition process on sheet resistance of deposited layers has been showed. In order to obtain the lowest resistivity of the thin contact layer, optimal set of sputtering parameters, i.e. power applied, deposition time and deposition pressure was found. The resistivity of the contact between two adjacent Al metal fingers deposited onto transparent conductive Al-doped zinc oxide film has been also examined.
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Krawczak, Ewelina; Gułkowski, Sławomir
2017-10-01
The use of aluminum contacts is common in the process of silicon solar cells production because of low contact resistivity. It has also a great importance in thin film technology for photovoltaics, especially in copper-indium-gallium-diselenide (CIGS) devices. The final stage of CIGS cell production is the top contact deposition of high conductivity layer for lateral current collection. Such material has to be highly optically transparent as well. In order to make a contact, metal is deposited onto TCO layer with minimum shadowing to allow as much light as possible into device. The metal grid contact is being made by deposition of few microns of aluminum. The resistivity of the deposited material as well as resistance between the metal grid and TCO layer plays a great role in high quality solar cell production. This paper presents the results of four point probe conductivity analysis of Al thin films deposited by direct current (DC) magnetron sputtering method. Influence of technological parameters of the Al deposition process on sheet resistance of deposited layers has been showed. In order to obtain the lowest resistivity of the thin contact layer, optimal set of sputtering parameters, i.e. power applied, deposition time and deposition pressure was found. The resistivity of the contact between two adjacent Al metal fingers deposited onto transparent conductive Al-doped zinc oxide film has been also examined.
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Liu, Qibin; Zhu, Weidong; Zou, Longjiang; Zheng, Min; Dong, Chuang
2005-12-01
The gradient bioceramics coating was prepared on the surface of Ti-6Al-4V alloy by using wide-band laser cladding. And the effect of technological parameters of wide-band laser cladding on microstructure and sinterability of gradient bioceramics composite coating was studied. The experimental results indicated that in the circumstances of size of laser doze D and scanning velocity V being fixed, with the increasement of power P, the density of microstructure in bioceramics coating gradually degraded; with the increasement of power P, the pore rate of bioceramics gradually became high. While P = 2.3 KW, the bioceramics coating with dense structure and lower pore rate (5.11%) was obtained; while P = 2.9 KW, the bioceramics coating with disappointing density was formed and its pore rate was up to 21.32%. The microhardness of bioceramics coating demonstrated that while P = 2.3 KW, the largest value of microhardness of bioceramics coating was 1100 HV. Under the condition of our research work, the optimum technological parameters for preparing gradient bioceramics coating by wide-band laser cladding are: P = 2.3 KW, V = 145 mm/min, D = 16 mm x 2 mm.
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Angular distributions of particles sputtered from multicomponent targets with gas cluster ions
Energy Technology Data Exchange (ETDEWEB)
Ieshkin, A.E. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Ermakov, Yu.A., E-mail: yuriermak@yandex.ru [Skobeltsyn Nuclear Physics Research Institute, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Chernysh, V.S. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation)
2015-07-01
The experimental angular distributions of atoms sputtered from polycrystalline W, Cd and Ni based alloys with 10 keV Ar cluster ions are presented. RBS was used to analyze a material deposited on a collector. It has been found that the mechanism of sputtering, connected with elastic properties of materials, has a significant influence on the angular distributions of sputtered components. The effect of non-stoichiometric sputtering at different emission angles has been found for the alloys under cluster ion bombardment. Substantial smoothing of the surface relief was observed for all targets irradiated with cluster ions.
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The influence of landing points on the sputtering of mono-crystal solids due to cluster impacting
Energy Technology Data Exchange (ETDEWEB)
Niu, Guo-jian; Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi, E-mail: zsyang@ipp.ac.cn; Luo, Guang-nan, E-mail: gnluo@ipp.ac.cn
2017-01-15
The mechanism of sputtering due to cluster impacting which has been widely studied is an important but unsolved problem. In present research, we discuss the effect of the landing point on the sputtering with the method of molecular dynamics. The results show that the landing points play significant roles on sputter yield when the temperature of target is low. Specific landing points can cause particular sputtering patterns which lead to different sputtering yield and moving directions of sputtered atoms. The mechanism of this phenomenon is that specific landing keeps symmetries and anisotropies of target lattice, which influence the sputtering yield.
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Hsiao, Francis C.; Bock, Gerald N.; Eisen, Daniel B.
2012-01-01
Background Laser plays an increasingly prominent role in skin rejuvenation. The advent of fractional photothermolysis revolutionizes its application. Microcolumns of skin are focally injured, leaving intervening normal skin to facilitate rapid wound healing and orderly tissue remodeling. The Problem Even with the popularity of fractional laser devices, we still have limited knowledge about the ideal treatment parameters and postlaser wound care. Basic/Clinical Science Advances Many clinicians believe that higher microbream energy in fractional laser devices results in better clinical outcome. Two recent studies argue against this assumption. One article demonstrates that lower fluence can induce comparable molecular changes with fewer side effects. Another study corroborates this by showing that lower-density settings produce similar clinical outcome in scar remodeling as higher-density ones, but with fewer side effects. To shed light on the optimal post-treatment wound care regimen from fractional ablative resurfacing, another paper shows that platelet-rich plasma (PRP) can reduce transepidermal water loss and skin color changes within 1 month after treatment. Clinical Care Relevance For fractional nonablative resurfacing, lower settings in fluence or density may produce similar dermal remodeling as higher settings and with a better side-effect profile. Moreover, autologous PRP appears to expedite wound healing after fractional ablative resurfacing. Conclusion Lower microbeam energy in fractional laser resurfacing produces similar molecular changes and clinical outcome with fewer side effects. The findings might portend a shift in the paradigm of treatment parameters. Autologous PRP can facilitate better wound healing, albeit modestly. Long-term follow-ups and larger studies are necessary to confirm these findings. PMID:24527307
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Optical characterisation of sputtered hydrogenated amorphous silicon thin films
International Nuclear Information System (INIS)
Mellassi, K.; Chafik El Idrissi, M.; Chouiyakh, A.; Rjeb, A.; Barhdadi, A.
2000-09-01
The present work is devoted to the study of some optical properties of hydrogenated amorphous silicon (a-Si:H) thin films prepared by radio-frequency cathodic sputtering technique. It is essentially focused on investigating separately the effects of increasing partial hydrogen pressure during the deposition stage, and the effects of post deposition thermal annealing on the main optical parameters of the deposited layers (refraction index, optical gap Urbach energy, etc.). We show that low hydrogen pressures allow a saturation of the dangling bonds in the material, while high pressures lead to the creation of new defects. We also show that thermal annealing under moderate temperatures allows a good improvement of the structural quality of deposited films. (author)
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Laboratory for Laser Energetics annual report, 1 October 1984-30 September 1985
International Nuclear Information System (INIS)
1986-01-01
Overviews of the GDL and OMEGA facilities are given. The retrofit of the GDL with liquid crystal polarizers is described. Synchronization of the actively mode-locked and actively Q-switched oscillators is described. Progress in laser fusion includes a theory of electron heat transport, sputter-coating of laser targets, absorption line measurement of the tamper, x-ray conversion for high-Z targets, mass ablation in uv-irradiated targets, uv target designs, stimulated Raman scattering in a collisional homogeneous plasma, and absorption spectroscopy as a diagnostic. 267 refs., 134 figs., 113 tabs
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Recent advancements in sputter-type heavy negative ion sources
International Nuclear Information System (INIS)
Alton, G.D.
1989-01-01
Significant advancement have been made in sputter-type negative ion sources which utilize direct surface ionization, or a plasma to form the positive ion beam used to effect sputtering of samples containing the material of interest. Typically, such sources can be used to generate usable beam intensities of a few μA to several mA from all chemically active elements, depending on the particular source and the electron affinity of the element in question. The presentation will include an introduction to the fundamental processes underlying negative ion formation by sputtering from a low work function surface and several sources will be described which reflect the progress made in this technology. 21 refs., 9 figs., 1 tab
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Energy Technology Data Exchange (ETDEWEB)
Lee, JongWoo [Department of Materials Science and Engineering, Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of); Hui, K.N. [Department of Mechanical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of); Hui, K.S., E-mail: kshui@hanyang.ac.kr [Department of Mechanical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of); Cho, Y.R., E-mail: yescho@pusan.ac.kr [Department of Materials Science and Engineering, Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of); Chun, Ho-Hwan [Global Core Research Center for Ships and Offshore Plants (GCRC-SOP), Pusan National University, San 30 Jangjeon-dong, Geumjeong-gu, Busan 609-735 (Korea, Republic of)
2014-02-28
Ni–Al co-doped ZnO (NiAl:ZnO) thin films were deposited on glass substrates by DC magnetron sputtering in Ar using a single ceramic, spark-plasma-sintered target with 2 wt% Al and 5 wt% Ni. The effects of the sputtering power and gas pressure on the NiAl:ZnO films were studied. The structural, electrical, and optical properties of the films were characterized by X-ray diffraction, field emission scanning electron microscopy, Hall effect measurements and UV–vis transmission spectroscopy. As the sputtering power and gas pressure increased, the crystallinity, electrical properties and optical band gap of the films were improved. The NiAl:ZnO film deposited at 40 W at 6.0 mTorr had the strongest (0 0 2) XRD peak and the lowest resistivity of approximately 2.19 × 10{sup −3} Ω cm with an optical transmittance of 90%.
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Changes in X-ray photoelectron spectra of yttria-tetragonal zirconia polycrystal by ion sputtering
Energy Technology Data Exchange (ETDEWEB)
Watanabe, Eiko; Yoshinari, Masao [Tokyo Dental College, Oral Health Science Center, Tokyo, Chiyoda-ku (Japan)
2016-04-15
This paper reports changes in X-ray photoelectron spectroscopy spectra of yttria-tetragonal zirconia polycrystal (Y-TZP) brought about by Ar ion sputtering. The changes in the core-level spectra of Y-TZP suggest that preferential sputtering of oxygen occurred. A new peak was observed near 0 eV binding energy accompanied with changes in the core-level spectra by the sputtering. After 18 h in a high vacuum following the sputtering, the spectra changed by the sputtering were returned to their original shapes. In contrast, the color of Y-TZP was changed from white to pale brown by X-ray irradiation and was changed from pale brown to dark gray by ion sputtering. However, when the new peak near 0 eV decreased after 18 h, no color change was observed. Therefore, it is thought that the new peak was mainly derived from electrons trapped in various kinds of oxygen vacancies created by the sputtering in other than color centers. (orig.)