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Sample records for ion implanted ultrahigh

  1. Thermal characterization of Ag and Ag + N ion implanted ultra-high molecular weight polyethylene (UHMWPE)

    Science.gov (United States)

    Sokullu Urkac, E.; Oztarhan, A.; Tihminlioglu, F.; Kaya, N.; Ila, D.; Muntele, C.; Budak, S.; Oks, E.; Nikolaev, A.; Ezdesir, A.; Tek, Z.

    2007-08-01

    Most of total hip joints are composed of ultra-high molecular weight polyethylene (UHMWPE). However, as ultra-high molecular weight polyethylene is too stable in a body, wear debris may accumulate and cause biological response such as bone absorption and loosening of prosthesis. In this study, ultra-high molecular weight polyethylene samples were Ag and Ag + N hybrid ion implanted by using MEVVA ion implantation technique to improve its surface properties. Samples were implanted with a fluence of 1017 ion/cm2 and extraction voltage of 30 kV. Implanted and unimplanted samples were investigated by thermo-gravimetry analysis (TGA), differential scanning calorimetry (DSC), X-ray diffraction (XRD) analysis, scanning electron microscopy (SEM), optical microscopy (OM) and contact Angle measurement. Thermal characterization results showed that the ion bombardment induced an increase in the % crystallinity, onset and termination degradation temperatures of UHMWPE.

  2. Thermal characterization of Ag and Ag + N ion implanted ultra-high molecular weight polyethylene (UHMWPE)

    Energy Technology Data Exchange (ETDEWEB)

    Sokullu Urkac, E. [Department of Materials Science, Izmir High Technology Institute, Gulbahcekoyu Urla, Izmir (Turkey)]. E-mail: emelsu@gmail.com; Oztarhan, A. [Bioengineering Department, Ege University, Bornova, Izmir 35100 (Turkey); Tihminlioglu, F. [Department of Chemical Engineering, Izmir High Technology Institute, Gulbahcekoyu Urla, Izmir (Turkey); Kaya, N. [Bioengineering Department, Ege University, Bornova, Izmir 35100 (Turkey); Ila, D. [Center for Irradiation of Materials, Alabama A and M University, Normal AL 35762 (United States); Muntele, C. [Center for Irradiation of Materials, Alabama A and M University, Normal AL 35762 (United States); Budak, S. [Center for Irradiation of Materials, Alabama A and M University, Normal AL 35762 (United States); Oks, E. [H C Electronics Institute, Tomsk (Russian Federation); Nikolaev, A. [H C Electronics Institute, Tomsk (Russian Federation); Ezdesir, A. [R and D Department, PETKIM Holding A.S., Aliaga, Izmir 35801 (Turkey); Tek, Z. [Department of Physics, Celal Bayar University, Manisa (Turkey)

    2007-08-15

    Most of total hip joints are composed of ultra-high molecular weight polyethylene (UHMWPE ). However, as ultra-high molecular weight polyethylene is too stable in a body, wear debris may accumulate and cause biological response such as bone absorption and loosening of prosthesis. In this study, ultra-high molecular weight polyethylene samples were Ag and Ag + N hybrid ion implanted by using MEVVA ion implantation technique to improve its surface properties. Samples were implanted with a fluence of 10{sup 17} ion/cm{sup 2} and extraction voltage of 30 kV. Implanted and unimplanted samples were investigated by thermo-gravimetry analysis (TGA), differential scanning calorimetry (DSC), X-ray diffraction (XRD) analysis, scanning electron microscopy (SEM), optical microscopy (OM) and contact Angle measurement. Thermal characterization results showed that the ion bombardment induced an increase in the % crystallinity, onset and termination degradation temperatures of UHMWPE.

  3. Dynamic ion implantation

    International Nuclear Information System (INIS)

    Oppenheim, I.F.C.

    1988-01-01

    The Dynamic Ion Implantation Technique consists of ion implantation of a film during the film-deposition process. This technique was investigated theoretically and experimentally with ions whose incident energy is of the order of a few times 100 keV. It was found to be a viable alternative low-temperature method for the preparation of thick zirconium nitride films (∼1 μm) with good mechanical properties. Theoretical modeling of the processes involved during dynamic ion implantation lead to analytical expressions for the ions' depth-profile distributions. Numerical evaluations of these equations indicated that the depth distributions of dynamically implanted ions are in general more uniform than those predicted by the model for ions implanted by more conventional techniques. Mechanical properties of stoichiometric RF sputter-deposited zirconium nitride films post implanted with krypton and rubidium ions were investigated. Scratch-adhesion critical load and Vickers microhardness of samples implanted with doses varying from 1 x 10 15 to 5 x 10 16 ions/cm 2 and energies ranging from 300 to 500 keV were studied. In general, best mechanical properties were observed for 300- keV krypton implantations

  4. Ion implantation technology

    CERN Document Server

    Downey, DF; Jones, KS; Ryding, G

    1993-01-01

    Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approach

  5. Quantitative ion implantation

    International Nuclear Information System (INIS)

    Gries, W.H.

    1976-06-01

    This is a report of the study of the implantation of heavy ions at medium keV-energies into electrically conducting mono-elemental solids, at ion doses too small to cause significant loss of the implanted ions by resputtering. The study has been undertaken to investigate the possibility of accurate portioning of matter in submicrogram quantities, with some specific applications in mind. The problem is extensively investigated both on a theoretical level and in practice. A mathematical model is developed for calculating the loss of implanted ions by resputtering as a function of the implanted ion dose and the sputtering yield. Numerical data are produced therefrom which permit a good order-of-magnitude estimate of the loss for any ion/solid combination in which the ions are heavier than the solid atoms, and for any ion energy from 10 to 300 keV. The implanted ion dose is measured by integration of the ion beam current, and equipment and techniques are described which make possible the accurate integration of an ion current in an electromagnetic isotope separator. The methods are applied to two sample cases, one being a stable isotope, the other a radioisotope. In both cases independent methods are used to show that the implantation is indeed quantitative, as predicted. At the same time the sample cases are used to demonstrate two possible applications for quantitative ion implantation, viz. firstly for the manufacture of calibration standards for instrumental micromethods of elemental trace analysis in metals, and secondly for the determination of the half-lives of long-lived radioisotopes by a specific activity method. It is concluded that the present study has advanced quantitative ion implantation to the state where it can be successfully applied to the solution of problems in other fields

  6. Plasma source ion implantation

    International Nuclear Information System (INIS)

    Conrad, J.R.; Forest, C.

    1986-01-01

    The authors' technique allows the ion implantation to be performed directly within the ion source at higher currents without ion beam extraction and transport. The potential benefits include greatly increased production rates (factors of 10-1000) and the ability to implant non-planar targets without rastering or shadowing. The technique eliminates the ion extractor grid set, beam raster equipment, drift space and target manipulator equipment. The target to be implanted is placed directly within the plasma source and is biased to a large negative potential so that plasma ions gain energy as they accelerate through the potential drop across the sheath that forms at the plasma boundary. Because the sheath surrounds the target on all sides, all surfaces of the target are implanted without the necessity to raster the beam or to rotate the target. The authors have succeeded in implanting nitrogen ions in a silicon target to the depths and concentrations required for surface treatment of materials like stainless steel and titanium alloys. They have performed ESCA measurements of the penetration depth profile of a silicon target that was biased to 30 kV in a nitrogen discharge plasma. Nitrogen ions were implanted to a depth of 700A at a peak concentration of 30% atomic. The measured profile is quite similar to a previously obtained profile in titanium targets with conventional techniques

  7. Ion implantation into diamond

    International Nuclear Information System (INIS)

    Sato, Susumu

    1994-01-01

    The graphitization and the change to amorphous state of diamond surface layer by ion implantation and its characteristics are reported. In the diamond surface, into which more than 10 16 ions/cm 2 was implanted, the diamond crystals are broken, and the structure changes to other carbon structure such as amorphous state or graphite. Accompanying this change of structure, the electric conductivity of the implanted layer shows two discontinuous values due to high resistance and low resistance. This control of structure can be done by the temperature of the base during the ion implantation into diamond. Also it is referred to that by the base temperature during implantation, the mutual change of the structure between amorphous state and graphite can be controlled. The change of the electric resistance and the optical characteristics by the ion implantation into diamond surface, the structural analysis by Raman spectroscopy, and the control of the structure of the implanted layer by the base temperature during implantation are reported. (K.I.)

  8. Ion implantation - an introduction

    International Nuclear Information System (INIS)

    Townsend, P.D.

    1986-01-01

    Ion implantation is a widely used technique with a literature that covers semiconductor production, surface treatments of steels, corrosion resistance, catalysis and integrated optics. This brief introduction outlines advantages of the technique, some aspects of the underlying physics and examples of current applications. Ion implantation is already an essential part of semiconductor technology while in many other areas it is still in an early stage of development. The future scope of the subject is discussed. (author)

  9. Ion implantation in metals

    International Nuclear Information System (INIS)

    Vook, F.L.

    1977-02-01

    The application of ion beams to metals is rapidly emerging as a promising area of research and technology. This report briefly describes some of the recent advances in the modification and study of the basic properties of metals by ion implantation techniques. Most of the research discussed illustrates some of the new and exciting applications of ion beams to metals which are under active investigation at Sandia Laboratories, Albuquerque

  10. Ion implantation in ices

    International Nuclear Information System (INIS)

    Strazzulla, G.; Baratta, G.A.; Palumbo, M.E.; Satorre, M.A.

    2000-01-01

    We have studied, by in situ infrared spectroscopy, some effects due to ion implantation in frozen ices. In particular mixtures containing C, N and O atoms (e.g., N 2 :H 2 O:CH 4 ) have been irradiated with unreactive (noble gases) ions: the resulting alteration of the frozen sample induces the formation of other molecules (e.g., CO 2 , R- - -OCN, CO and HCN) and of a refractory organic residue. Similar products are formed when mixtures containing only C and O atoms (e.g., H 2 O:CH 4 ) are irradiated with N ions, i.e. molecular species that include the projectile are formed. These results are important, in particular for their applications to planetary physics. In planetary environments ice thickness is usually much larger than the penetration depth of the relevant ion populations (solar wind ions, magnetospheric particles, etc.) and ion implantation phenomena are expected. Our results indicate that some molecular species observed on icy planetary surfaces could not be native of that object but formed by ion irradiation and/or by implantation of reactive ions

  11. Ion implantation for semiconductors

    International Nuclear Information System (INIS)

    Grey-Morgan, T.

    1995-01-01

    Full text: Over the past two decades, thousands of particle accelerators have been used to implant foreign atoms like boron, phosphorus and arsenic into silicon crystal wafers to produce special embedded layers for manufacturing semiconductor devices. Depending on the device required, the atomic species, the depth of implant and doping levels are the main parameters for the implantation process; the selection and parameter control is totally automated. The depth of the implant, usually less than 1 micron, is determined by the ion energy, which can be varied between 2 and 600 keV. The ion beam is extracted from a Freeman or Bernas type ion source and accelerated to 60 keV before mass analysis. For higher beam energies postacceleration is applied up to 200 keV and even higher energies can be achieved by mass selecting multiplycharged ions, but with a corresponding reduction in beam output. Depending on the device to be manufactured, doping levels can range from 10 10 to 10 15 atoms/cm 2 and are controlled by implanter beam currents in the range up to 30mA; continuous process monitoring ensures uniformity across the wafer of better than 1 % . As semiconductor devices get smaller, additional sophistication is required in the design of the implanter. The silicon wafers charge electrically during implantation and this charge must be dissipated continuously to reduce the electrical stress in the device and avoid destructive electrical breakdown. Electron flood guns produce low energy electrons (below 10 electronvolts) to neutralize positive charge buildup and implanter design must ensure minimum contamination by other isotopic species and ensure low internal sputter rates. The pace of technology in the semiconductor industry is such that implanters are being built now for 256 Megabit circuits but which are only likely to be widely available five years from now. Several specialist companies manufacture implanter systems, each costing around US$5 million, depending on the

  12. Ion Implantation of Polymers

    DEFF Research Database (Denmark)

    Popok, Vladimir

    2012-01-01

    is put on the low-energy implantation of metal ions causing the nucleation and growth of nanoparticles in the shallow polymer layers. Electrical, optical and magnetic properties of metal/polymer composites are under the discussion and the approaches towards practical applications are overviewed....

  13. Ion implantation for materials processing

    International Nuclear Information System (INIS)

    Smidt, F.A.

    1983-01-01

    This book reviews current research on ion implantation for materials processing as a viable technique for improving surface properties of metals and alloys-wear, fatigue, and corrosion. An introductory section on new potential applications of ion beam technology is provided. Contents: New potential applications of ion beam technology; ion implantation science and technology; wear and fatigue; corrosion; other research areas

  14. Ion implantation: an annotated bibliography

    International Nuclear Information System (INIS)

    Ting, R.N.; Subramanyam, K.

    1975-10-01

    Ion implantation is a technique for introducing controlled amounts of dopants into target substrates, and has been successfully used for the manufacture of silicon semiconductor devices. Ion implantation is superior to other methods of doping such as thermal diffusion and epitaxy, in view of its advantages such as high degree of control, flexibility, and amenability to automation. This annotated bibliography of 416 references consists of journal articles, books, and conference papers in English and foreign languages published during 1973-74, on all aspects of ion implantation including range distribution and concentration profile, channeling, radiation damage and annealing, compound semiconductors, structural and electrical characterization, applications, equipment and ion sources. Earlier bibliographies on ion implantation, and national and international conferences in which papers on ion implantation were presented have also been listed separately

  15. Ion implantation in Thailand (I) - development of ion implantation facilities

    International Nuclear Information System (INIS)

    Vilaithong, T.; Suwannakachorn, D.; Yotsombat, B.; Boonyawan, D.; Charoennugul, R.; Vichaisirimongkol, P.; Aumkaew, S.; A-No, V.

    1997-01-01

    Ion implantation with its many advantages has been widely and rapidly developed in the world to be a novel material treatment technique, which holds significance in both academic research and technical application. In order to develop and apply the ion implantation technique in the country, Thailand has launched a program to establish an ion beam center at Chiang Mai University. By efforts made during the past six years, the University has completed construction and installation of a 150-kV, research-purpose ion implantation facility, which consists of two beam lines - a 00 non-analyzed line and a 450 analyzed line, and which is being put into regular operation, and a 20-kV, high-current ion implanter based on a duoplasmatron ion source for non-analyzed N-ion beam implantation, and a high-intensity, multi cusp ion source for special implantation purposes. The facilities have formed powerful tools for research, teaching and engineering application, and have played an indispensable role in promoting development of novel techniques in the country

  16. Tungsten contamination in ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Polignano, M.L., E-mail: maria.polignano@st.com; Barbarossa, F.; Galbiati, A.; Magni, D.; Mica, I.

    2016-06-15

    In this paper the tungsten contamination in ion implantation processes is studied by DLTS analysis both in typical operating conditions and after contamination of the implanter by implantation of wafers with an exposed tungsten layer. Of course the contaminant concentration is orders of magnitude higher after contamination of the implanter, but in addition our data show that different mechanisms are active in a not contaminated and in a contaminated implanter. A moderate tungsten contamination is observed also in a not contaminated implanter, however in that case contamination is completely not energetic and can be effectively screened by a very thin oxide. On the contrary, the contamination due to an implantation in a previously contaminated implanter is reduced but not suppressed even by a relatively thick screen oxide. The comparison with SRIM calculations confirms that the observed deep penetration of the contaminant cannot be explained by a plain sputtering mechanism.

  17. Surface microhardening by ion implantation

    International Nuclear Information System (INIS)

    Singh, Amarjit

    1986-01-01

    The paper discusses the process and the underlying mechanism of surface microhardening by implanting suitable energetic ions in materials like 4145 steel, 304 stainless steel, aluminium and its 2024-T351 alloy. It has been observed that boron and nitrogen implantation in materials like 4145 steel and 304 stainless steel can produce a significant increase in surface hardness. Moreover the increase can be further enhanced with suitable overlay coatings such as aluminium (Al), Titanium (Ti) and carbon (C). The surface hardening due to implantation is attributed to precipitation hardening or the formation of stable/metastable phase or both. The effect of lithium implantation in aluminium and its alloy on microhardness with increasing ion dose and ion beam energy is also discussed. (author)

  18. Fingerprinting diamonds using ion implantation

    International Nuclear Information System (INIS)

    DeVries, R.C.; Reihl, R.F.; Tuft, R.E.

    1989-01-01

    It is possible to ion implant patterns in diamond crystals at fluences below that which would impart visible damage and then to reveal those patterns by electrostatic charging and dusting. The charge distribution - and therefore the dust attachment - is related to the difference in electrical conductivity between the implanted region and the rest of the crystal. The technique may have applicability for ''fingerprinting'' or personalizing diamond gemstones. (author)

  19. Surface engineering by ion implantation

    International Nuclear Information System (INIS)

    Nielsen, Bjarne Roger

    1995-01-01

    Awidespread commercial applica tion iof particle accelerators is for ion implantation. Accelerator beams are used for ion implantation into metals, alloying a thin surface layer with foreign atoms to concentrations impossible to achieve by thermal processes, making for dramatic improvements in hardness and in resistance to wear and corrosion. Traditional hardening processes require high temperatures causing deformation; ion implantation on the other hand is a ''cold process'', treating the finished product. The ionimplanted layer is integrated in the substrate, avoiding the risk of cracking and delamination from normal coating processes. Surface properties may be ''engineered'' independently of those of the bulk material; the process does not use environmentally hazardous materials such as chromium in the surface coating. The typical implantation dose required for the optimum surface properties of metals is around 2 x 10 17 ion/cm 2 , a hundred times the typical doses for semiconductor processing. When surface areas of more than a few square centimetres have to be treated, the implanter must therefore be able to produce high beam currents (5 to 10 mA) to obtain an acceptable treatment time. Ion species used include nitrogen, boron, carbon, titanium, chromium and tantalum, and beam energies range from 50 to 200 keV. Since most components are three dimensional, it must be possible to rotate and tilt them in the beam, and control beam position over a large area. Examples of industrial applications are: - surface treatment of prostheses (hip and knee joints) to reduce wear of the moving parts, using biocompatible materials; - ion implantation into high speed ball bearings to protect against the aqueous corrosion in jet engines (important for service helicopters on oil rigs); - hardening of metal forming and cutting tools; - reduction of corrosive wear of plastic moulding tools, which are expensive to produce

  20. Ion implantation in semiconductor bodies

    International Nuclear Information System (INIS)

    Badawi, M.H.

    1984-01-01

    Ions are selectively implanted into layers of a semiconductor substrate of, for example, semi-insulating gallium arsenide via a photoresist implantation mask and a metallic layer of, for example, titanium disposed between the substrate surface and the photoresist mask. After implantation the mask and metallic layer are removed and the substrate heat treated for annealing purposes. The metallic layer acts as a buffer layer and prevents possible contamination of the substrate surface, by photoresist residues, at the annealing stage. Such contamination would adversely affect the electrical properties of the substrate surface, particularly gallium arsenide substrates. (author)

  1. Hardness of ion implanted ceramics

    International Nuclear Information System (INIS)

    Oliver, W.C.; McHargue, C.J.; Farlow, G.C.; White, C.W.

    1985-01-01

    It has been established that the wear behavior of ceramic materials can be modified through ion implantation. Studies have been done to characterize the effect of implantation on the structure and composition of ceramic surfaces. To understand how these changes affect the wear properties of the ceramic, other mechanical properties must be measured. To accomplish this, a commercially available ultra low load hardness tester has been used to characterize Al 2 O 3 with different implanted species and doses. The hardness of the base material is compared with the highly damaged crystalline state as well as the amorphous material

  2. Mutagenic effects of ion implanted rice seed

    International Nuclear Information System (INIS)

    Wang Cailian; Shen Mei; Chen Qiufang

    1996-04-01

    Dry seeds of rice were implanted with 15∼30 keV N + , H + , Ar + ion beam of various doses. The biological effects in M 1 and mutation in M 2 were studied. The results showed that ion beam could induce the variation on the chromosome structure and inhibit mitosis in root tip cell. The chromosomal aberration rate of cells tended to be increased with increase of implanted ion dose. Compared with 60 Co γ-rays, ion implantation induced lower rate of cells with chromosome aberration. However, there was a similar inhibitory effect on mitosis between ion beam and γ-rays. The electrophoretic banding patterns of peroxidase enzymes were altered by both mutagens and varied. Frequency of the chlorophyll mutation implanted by ion beam was higher than that induced by γ-rays. Mutation frequencies of heading date and plant height were similar between ion beam implanting and γ-rays irradiation. (11 tabs., 2 figs.)

  3. Ion implantations of oxide dispersion strengthened steels

    Energy Technology Data Exchange (ETDEWEB)

    Sojak, S., E-mail: stanislav.sojak@stuba.sk; Simeg Veternikova, J.; Slugen, V.; Petriska, M.; Stacho, M.

    2015-12-15

    Highlights: • ODS steel MA 956 was studied after thermal treatment and ion implantations. • Increase of the defects size was observed after hydrogen ions implantation. • Intensity/amount of the defects did not increase after ion implantations. • Due to defects aggregation defects concentration decreased. - Abstract: This paper is focused on a study of radiation damage and thermal stability of high chromium oxide dispersion strengthened steel MA 956 (20% Cr), which belongs to the most perspective structural materials for the newest generation of nuclear reactors – Generation IV. The radiation damage was simulated by the implantation of hydrogen ions up to the depth of about 5 μm, which was performed at a linear accelerator owned by Slovak University of Technology. The ODS steel MA 956 was available for study in as-received state after different thermal treatments as well as in ions implanted state. Energy of the hydrogen ions chosen for the implantation was 800 keV and the implantation fluence of 6.24 × 10{sup 17} ions/cm{sup 2}. The investigated specimens were measured by non-destructive technique Positron Annihilation Lifetime Spectroscopy in order to study the defect behavior after different thermal treatments in the as-received state and after the hydrogen ions implantation. Although, different resistance to defect production was observed in individual specimens of MA 956 during the irradiation, all implanted specimens contain larger defects than the ones in as-received state.

  4. High-energy ion implantation of materials

    International Nuclear Information System (INIS)

    Williams, J.M.

    1991-11-01

    High-energy ion implantation is an extremely flexible type of surface treatment technique, in that it offers the possibility of treating almost any type of target material or product with ions of almost any chemical species, or combinations of chemical species. In addition, ion implantations can be combined with variations in temperature during or after ion implantation. As a result, the possibility of approaching a wide variety of surface-related materials science problems exists with ion implantation. This paper will outline factors pertinent to application of high-energy ion implantation to surface engineering problems. This factors include fundamental advantages and limitations, economic considerations, present and future equipment, and aspects of materials science

  5. Mutagenic effects of ion implantation on stevia

    International Nuclear Information System (INIS)

    Wang Cailian; Shen Mei; Chen Qiufang; Lu Ting; Shu Shizhen

    1998-01-01

    Dry seeds of Stevia were implanted by 75 keV nitrogen and carbon ions with various doses. The biological effects in M 1 and mutation in M 2 were studied. The results showed that ion beam was able to induce variation on chromosome structure in root tip cells. The rate of cells with chromosome aberration was increased with ion beam dose. The rate of cells with chromosomal aberration was lower than that induced with γ-rays. Frequency of the mutation induced by implantation of N + and C + ions were higher than those induced by γ-rays. The rate of cell with chromosome aberration and in M 2 useful mutation induced by implantation of C + ion was higher than those induced by implantation of N + ion. Mutagenic effects Feng 1 x Riyuan and Riyuan x Feng 2 by implantation of N + and C + were higher than that of Jining and Feng 2

  6. Defect characteristics by boron cluster ion implantation

    International Nuclear Information System (INIS)

    Aoki, Takaaki; Matsuo, Jiro; Takaoka, Gikan; Toyoda, Noriaki; Yamada, Isao

    2003-01-01

    Cluster ion implantation using decaborane (B 10 H 14 ) has been proposed as a shallow implantation technique for LSI devices with gate lengths of several-tens nanometers. Experiments and computer simulations of low-energy boron monomers and decaborane clusters implantation were performed. Molecular dynamics simulations of B 10 cluster implantation have shown similar implant depth but different damage density and damage structure compared to monomer (B 1 ) ion implantation with the same energy-per-atom. For monomer implantation, point-defects such as vacancy-interstitial pairs are mainly formed. On the other hand, B 10 generates large numbers of defects within a highly-amorphised region at the impact location. This difference in damage structure produced during implantation is expected to cause different annihilation processes

  7. Development of industrial ion implantation technology

    International Nuclear Information System (INIS)

    Choi, Byung Ho; Hwang, Churl Kew; Kim, Wan; Jin, Jung Tai; Jung, Ki Sok; Yoon, Su Ho; Shin, Won Churl; Kim, Jong Gook; Han, Jeon Geon; Chung, Ki Hyung

    1994-01-01

    On a cooperation between KAERI, Kurchatov Institute (Russia), and Mirae Co., development of a metal ion implanter and ion implantation technology is performed on a basic idea of popularization and refinement of ion implantation technology applied to the industrial components. The developed implanter is a two beam type: the mass separation line produces several mA of metal ion beams and the non-separation line produces several tens of mA gas ion beams, thus making the synergistic effect possible by the irradiation of beams from both lines. The target is made of a rotating plate of 60cm in radius and can treat various types of industrial components or parts. About 60 kinds of specimens were treated for the development of implantation technology. Two or five times lengthening of longevities were achieved on the PCB drills, razor blades, cutters, and precision dies. (Author)

  8. Amorphization of metals by ion implantation and ion beam mixing

    International Nuclear Information System (INIS)

    Rauschenbach, B.; Heera, V.

    1988-01-01

    Amorphous metallic systems can be formed either by high-fluence ion implantation of glassforming species or by irradiation of layered metal systems with inert gas ions. Both techniques and experimental examples are presented. Empirical rules are discussed which predict whether a given system can be transformed into an amorphous phase. Influence of temperature, implantation dose and pre-existing crystalline metal composition on amorphization is considered. Examples are given of the implantation induced amorphous structure, recrystallization and formation of quasicrystalline structures. (author)

  9. Effect of anomalous drift during ion implantation

    International Nuclear Information System (INIS)

    Aleksandrov, P.A.; Baranova, E.K.; Beloshitskii, V.V.; Demakov, K.D.; Starostin, V.A.

    1986-01-01

    Experimental and theoretical results are presented on Tl-ion implantation into hot silicon substrates (approx. 1200 0 C). a An anomalously large (by more than an order of magnitude) displacement of the peak position of the implanted impurity distribution into the bulk of the substrate is found. b) The conclusion is drawn that the basic process responsible for this displacement of the peak is radiation-enhanced diffusion (RED) due to nonequilibrium concentration of point defects produced in the heated target directly under implantation. c) The crystalline structure of the resulting ion-implanted layer indicates that in-situ annealing of the exposed layer occurs during high-temperature implantation. d) Experimental impurity distributions confirm the possibility of producing an implanted-impurity 'buried layer' below the layer of a single crystal silicon, the 'buried layer' depth depending on the implantation regime. (author)

  10. Ion implantation into concave polymer surface

    Energy Technology Data Exchange (ETDEWEB)

    Sakudo, N. [Kanazawa Institute of Technology, Advanced Materials R and D Center, 3-1 Yatsukaho, Matto, Hakusan, Ishikawa 924-0838 (Japan)]. E-mail: sakudo@neptune.kanazawa-it.ac.jp; Shinohara, T. [Kanazawa Institute of Technology, Advanced Materials R and D Center, 3-1 Yatsukaho, Matto, Hakusan, Ishikawa 924-0838 (Japan); Amaya, S. [Kanazawa Institute of Technology, Advanced Materials R and D Center, 3-1 Yatsukaho, Matto, Hakusan, Ishikawa 924-0838 (Japan); Endo, H. [Kanazawa Institute of Technology, Advanced Materials R and D Center, 3-1 Yatsukaho, Matto, Hakusan, Ishikawa 924-0838 (Japan); Okuji, S. [Lintec Corp., 5-14-42 Nishiki-cho, Warabi, Saitama 335-0005 (Japan); Ikenaga, N. [Japan Science and Technology Corp., Nomigun, Ishikawa 923-1121 (Japan)

    2006-01-15

    A new technique for ion implantation into concave surface of insulating materials is proposed and experimentally studied. The principle is roughly described by referring to modifying inner surface of a PET (polyethylene terephthalate) bottle. An electrode that is supplied with positive high-voltage pulses is inserted into the bottle. Both plasma formation and ion implantation are simultaneously realized by the same high-voltage pulses. Ion sheath with a certain thickness that depends on plasma parameters is formed just on the inner surface of the bottle. Since the plasma potential is very close to that of the electrode, ions from the plasma are accelerated in the sheath and implanted perpendicularly into the bottle's inner surface. Laser Raman spectroscopy shows that the inner surface of an ion-implanted PET bottle is modified into DLC (diamond-like carbon). Gas permeation measurement shows that gas-barrier property enhances due to the modification.

  11. Boron precipitates in ion implanted silicon

    International Nuclear Information System (INIS)

    Wu, W.K.; Washburn, J.

    1975-03-01

    Long rod-like defects are observed in ion implanted silicon when boron is present either as a prior dopant addition or as the implanted species. Results of recent work indicates that these defects have the characteristics of narrow extrinsic dipoles or elongated dislocation loops and that there are two different types along each of the six (110) directions. An annealing kinetics method has been used to identify the nature of these defects formed during post-implantation annealing in boron ion (100 keV) implanted silicon irradiated at room temperature to a dose of 2 x 10 14 /cm 2 . It is concluded that at least two different kinds of rod-like defects exist in boron ion implanted silicon. From the activation energy for shrinkage, it is also concluded that one type (anti A) is composed largely of boron atoms. (U.S.)

  12. Ion beam analysis of metal ion implanted surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Evans, P.J.; Chu, J.W.; Johnson, E.P.; Noorman, J.T. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia); Sood, D.K. [Royal Melbourne Inst. of Tech., VIC (Australia)

    1993-12-31

    Ion implantation is an established method for altering the surface properties of many materials. While a variety of analytical techniques are available for the characterisation of implanted surfaces, those based on particle accelerators such as Rutherford backscattering (RBS) and nuclear reaction analysis (NRA) provide some of the most useful and powerful for this purpose. Application of the latter techniques to metal ion implantation research at ANSTO will be described with particular reference to specific examples from recent studies. Where possible, the information obtained from ion beam analysis will be compared with that derived from other techniques such as Energy Dispersive X-ray (EDX) and Auger spectroscopies. 4 refs., 5 figs.

  13. Silicon technologies ion implantation and thermal treatment

    CERN Document Server

    Baudrant, Annie

    2013-01-01

    The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

  14. Ion Implantation Processing Technologies for Telecommunications Electronics

    Energy Technology Data Exchange (ETDEWEB)

    Haynes, T E

    2000-05-01

    The subject CRADA was a collaboration between Oak Ridge National Laboratory and Bell Laboratories, Lucent Technologies (formerly AT and T Bell Laboratories) to explore the development of ion implantation technologies for silicon integrated circuit (IC) manufacturing.

  15. Magnetoreflection studies of ion implanted bismuth

    International Nuclear Information System (INIS)

    Nicolini, C.; Chieu, T.C.; Dresselhaus, M.S.; Massachusetts Inst. of Tech., Cambridge; Dresselhaus, G.

    1982-01-01

    The effect of the implantation of Sb ions on the electronic structure of the semimetal bismuth is studied by the magnetoreflection technique. The results show long electronic mean free paths and large implantation-induced increases in the band overlap and L-point band gap. These effects are opposite to those observed for Bi chemically doped with Sb. (author)

  16. Highly Stripped Ion Sources for MeV Ion Implantation

    Energy Technology Data Exchange (ETDEWEB)

    Hershcovitch, Ady

    2009-06-30

    Original technical objectives of CRADA number PVI C-03-09 between BNL and Poole Ventura, Inc. (PVI) were to develop an intense, high charge state, ion source for MeV ion implanters. Present day high-energy ion implanters utilize low charge state (usually single charge) ion sources in combination with rf accelerators. Usually, a MV LINAC is used for acceleration of a few rnA. It is desirable to have instead an intense, high charge state ion source on a relatively low energy platform (de acceleration) to generate high-energy ion beams for implantation. This de acceleration of ions will be far more efficient (in energy utilization). The resultant implanter will be smaller in size. It will generate higher quality ion beams (with lower emittance) for fabrication of superior semiconductor products. In addition to energy and cost savings, the implanter will operate at a lower level of health risks associated with ion implantation. An additional aim of the project was to producing a product that can lead to long­ term job creation in Russia and/or in the US. R&D was conducted in two Russian Centers (one in Tomsk and Seversk, the other in Moscow) under the guidance ofPVI personnel and the BNL PI. Multiple approaches were pursued, developed, and tested at various locations with the best candidate for commercialization delivered and tested at on an implanter at the PVI client Axcelis. Technical developments were exciting: record output currents of high charge state phosphorus and antimony were achieved; a Calutron-Bemas ion source with a 70% output of boron ion current (compared to 25% in present state-of-the-art). Record steady state output currents of higher charge state phosphorous and antimony and P ions: P{sup 2+} (8.6 pmA), P{sup 3+} (1.9 pmA), and P{sup 4+} (0.12 pmA) and 16.2, 7.6, 3.3, and 2.2 pmA of Sb{sup 3+} Sb {sup 4 +}, Sb{sup 5+}, and Sb{sup 6+} respectively. Ultimate commercialization goals did not succeed (even though a number of the products like high

  17. Ion-implantation dense cascade data

    International Nuclear Information System (INIS)

    Winterbon, K.B.

    1983-04-01

    A tabulation is given of data useful in estimating various aspects of ion-implantation cascades in the nuclear stopping regime, particularly with respect to nonlinearity of the cascade at high energy densities. The tabulation is restricted to self-ion implantation. Besides power-cross-section cascade dimensions, various material properties are included. Scaling of derived quantities with input data is noted, so one is not limited to the values assumed by the author

  18. Molecular ion sources for low energy semiconductor ion implantation (invited).

    Science.gov (United States)

    Hershcovitch, A; Gushenets, V I; Seleznev, D N; Bugaev, A S; Dugin, S; Oks, E M; Kulevoy, T V; Alexeyenko, O; Kozlov, A; Kropachev, G N; Kuibeda, R P; Minaev, S; Vizir, A; Yushkov, G Yu

    2016-02-01

    Smaller semiconductors require shallow, low energy ion implantation, resulting space charge effects, which reduced beam currents and production rates. To increase production rates, molecular ions are used. Boron and phosphorous (or arsenic) implantation is needed for P-type and N-type semiconductors, respectively. Carborane, which is the most stable molecular boron ion leaves unacceptable carbon residue on extraction grids. A self-cleaning carborane acid compound (C4H12B10O4) was synthesized and utilized in the ITEP Bernas ion source resulting in large carborane ion output, without carbon residue. Pure gaseous processes are desired to enable rapid switch among ion species. Molecular phosphorous was generated by introducing phosphine in dissociators via 4PH3 = P4 + 6H2; generated molecular phosphorous in a pure gaseous process was then injected into the HCEI Calutron-Bernas ion source, from which P4(+) ion beams were extracted. Results from devices and some additional concepts are described.

  19. Ion implantation in semiconductors and other materials

    International Nuclear Information System (INIS)

    Guernet, G.; Bruel, M.; Gailliard, J.P.; Garcia, M.; Robic, J.Y.

    1977-01-01

    The evolution of ion implantation techniques in the field of semiconductors and its extension to various fields such as metallurgy, mechanics, superconductivity and opto-electronics are considered. As for semiconductors ion implantation is evoked as: a means of predeposition of impurities at low doping level (10 11 to 10 14 cm -2 ); a means for obtaining profiles of controlled concentration; a means of reaching high doping levels with using 'strong current' implantation machines of the second generation. Some results obtained are presented [fr

  20. Krypton ion implantation effect on selenium nanowires

    Science.gov (United States)

    Panchal, Suresh; Chauhan, R. P.

    2017-08-01

    Among the rapidly progressing interdisciplinary areas of physics, chemistry, material science etc. ion induced modifications of materials is one such evolving field. It has been realized in recent years that a material, in the form of an accelerated ion beam, embedded into a target specimen offers a most productive tool for transforming its properties in a controlled manner. In semiconductors particularly, where the transport behavior is determined by very small concentrations of certain impurities, implantation of ions may bring considerable changes. The present work is based on the study of the effect of krypton ion implantation on selenium nanowires. Selenium nanowires of diameter 80 nm were synthesized by template assisted electro deposition technique. Implantation of krypton ions was done at Inter University Accelerator Centre (IUAC), New Delhi, India. The effect of implantation on structural, electrical and optical properties of selenium nanowires was investigated. XRD analysis of pristine and implanted nanowires shows no shifting in the peak position but there is a variation in the relative intensity with fluence. UV-Visible spectroscopy shows the decrease in the optical band gap with fluence. PL spectra showed emission peak at higher wavelength. A substantial rise in the current was observed from I-V measurements, after implantation and with the increase in fluence. The increase in current conduction may be due to the increase in the current carriers.

  1. Application of ion implantation in stevia breeding

    International Nuclear Information System (INIS)

    Wang Cailian; Chen Qiufang; Jin Wei; Lu Ting; Shu Shizhen

    1999-08-01

    Dry seed of stevia were implanted with 60-100 keV nitrogen ion and 75 keV carbon ion of various doses, and the effects of the composition and yield of stevioside were studied. The results showed that ion beam could induce variation in total stevioside yield and the composition of the plant. The best treatment was 75 keV nitrogen ion with 5 x 10 14 N + /cm 2 , the stevioside yield and Rebaudioside A (R-A) content were increased by 4.74% and 14.08% respectively. The effects induced by implantation of carbon ion were higher than those induced by implantation of nitrogen ion. Effects of Feng 1 x Ri Yuan and Ri Yuan x Feng 2 are higher than those of Ji Ning and Feng 2 . Seven mutation lines were selected from the mutation progenies. The stevioside composition of these lines were previously improved. The results suggest a potential application of ion implantation in stevia breeding

  2. Transverse microanalysis of high energy Ion implants

    Energy Technology Data Exchange (ETDEWEB)

    Dooley, S.P.; Jamieson, D.N.; Nugent, K.W.; Prawer, S. [Melbourne Univ., Parkville, VIC (Australia). School of Physics

    1996-12-31

    High energy ion implants in semiconductor materials have been analyzed by Channeling Contrast Microscopy (CCM) perpendicular to the implant direction, allowing imaging of the entire ion track. The damage produced by Channeled and Random 1.4 MeV H{sup +} implants into the edge of a <100> type IIa diamond wafer were analyzed by channeling into the face of the crystal. The results showed negligible damage in the surface region of the implants, and swelling induced misalignment at the end of range of the implants. Channeled 1.4 MeV H{sup +} implants in diamond had a range only 9% deeper than Random implants, which could be accounted for by dechanneling of the beam. The channeling of H{sup +}{sub 2} ions has been previously found to be identical to that of protons of half energy, however the current experiment has shown a 1% increase in {chi}{sub min} for H{sup +}{sub 2} in diamond compared to H{sup +} at 1,2 MeV per proton. This is due to repulsion between protons within the same channel. 5 refs., 2 figs.

  3. Cell adhesion and growth on ion-implanted polymer surface

    International Nuclear Information System (INIS)

    Lee, Jae-Suk; Kaibara, M.; Iwaki, M.; Sasabe, H.; Suzuki, Y.; Kusakabe, M.

    1992-01-01

    The adhesion and growth of endothelial cells on ion-implanted polystyrene and segmented polyurethane surface were investigated. Ions of Na + , N 2 + , O 2 + , Ar + and Kr + were implanted to the polymer surface with ion fluences between 1 x 10 15 and 3 x 10 17 ions/cm 2 at energy of 150 KeV at room temperature. Ion-implanted polymers were characterized by FT-IR-ATR an Raman spectroscopies. The adhesion and proliferation of bovine aorta endothelial cells on ion-implanted polymer surface were observed by an optical microscope. The rate of growth of BAECs on ion-implanted PSt was faster than that on non-implanted PSt. Complete cell adhesion and growth were observed on ion-implanted SPU, whereas the adhesion and growth of BAECs on the non-implanted SPU was not observed. It was attempted to control the cell culture on the ion-implanted domain fabricated using a mask. (author)

  4. Cobalt alloy ion sources for focused ion beam implantation

    Energy Technology Data Exchange (ETDEWEB)

    Muehle, R.; Doebeli, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland); Zimmermann, P. [Eidgenoessische Technische Hochschule, Zurich (Switzerland)

    1997-09-01

    Cobalt alloy ion sources have been developed for silicide formation by focused ion beam implantation. Four eutectic alloys AuCo, CoGe, CoY and AuCoGe were produced by electron beam welding. The AuCo liquid alloy ion source was investigated in detail. We have measured the emission current stability, the current-voltage characteristics, and the mass spectrum as a function of the mission current. (author) 1 fig., 2 refs.

  5. High current pelletron for ion implantation

    International Nuclear Information System (INIS)

    Schroeder, J.B.

    1989-01-01

    Since 1984, when the first production MeV ion implanter (an NEC model MV-T30) went on-line, interest in versatile electrostatic accelerator systems for MeV ion implantation has grown. The systems use a negative ion source to inject a tandem megavolt accelerator. In early systems the 0.4 mA of charging current from the two Pelletron charging chains in the accelerator was sufficient for the low intensity of beams from the ion source. This 2-chain system, however, is no longer adequate for the much higher beam intensities from today's improved ion sources. A 4-chain charging system, which delivers 1.3 mA to the high voltage terminal, was developed and is in operation in new models of NEC S Series Pelletron accelerators. This paper describes the latest beam performance of 1 MV and 1.7 MW Pelletron accelerators with this new 4-chain charging system. (orig.)

  6. High current pelletron for ion implantation

    Science.gov (United States)

    Schroeder, James B.

    1989-04-01

    Since 1984, when the first production MeV ion implanter (an NEC model MV-T30) went on-line, interest in versatile electrostatic accelerator systems for MeV ion implantation has grown. The systems use a negative ion source to inject a tandem megavolt accelerator. In early systems the 0.4 mA of charging current from the two Pelletron charging chains in the accelerator was sufficient for the low intensity of beams from the ion source. This 2-chain system, however, is no longer adequate for the much higher beam intensities from today's improved ion sources. A 4-chain charging system, which delivers 1.3 mA to the high voltage terminal, was developed and is in operation in new models of NEC S Series Pelletron accelerators. This paper describes the latest beam performance of 1 MV and 1.7 MV Pelletron accelerators with this new 4-chain charging system.

  7. Studies of ion implanted thermally oxidised chromium

    International Nuclear Information System (INIS)

    Muhl, S.

    1977-01-01

    The thermal oxidation of 99.99% pure chromium containing precise amounts of foreign elements has been studied and compared to the oxidation of pure chromium. Thirty-three foreign elements including all of the naturally occurring rare earth metals were ion implanted into chromium samples prior to oxidation at 750 0 C in oxygen. The role of radiation induced damage, inherent in this doping technique, has been studied by chromium implantations at various energies and doses. The repair of the damage has been studied by vacuum annealing at temperatures up to 800 0 C prior to oxidation. Many of the implants caused an inhibition of oxidation, the greatest being a 93% reduction for 2 x 10 16 ions/cm 2 of praseodymium. The distribution of the implant was investigated by the use of 2 MeV alpha backscattering and ion microprobe analysis. Differences in the topography and structure of the chromic oxide on and off the implanted area were studied using scanning electron and optical microscopy. X-ray diffraction analysis was used to investigate if a rare earth-chromium compound of a perovskite-type structure had been formed. Lastly, the electrical conductivity of chromic oxide on and off the implanted region was examined at low voltages. (author)

  8. Ion beam studies of hydrogen implanted Si wafers

    International Nuclear Information System (INIS)

    Nurmela, A.; Henttinen, K.; Suni, T.; Tolkki, A.; Suni, I.

    2004-01-01

    We have studied silicon-on-insulator (SOI) materials with two different ion beam analysis methods. The SOI samples were implanted with boron and hydrogen ions. After implantation the wafers were annealed, and some of them were bonded to thermally oxidized silicon wafers. The damage in silicon single crystal due to ion implantations has been studied by Rutherford Backscattering in the channeling mode (RBS/C). The content of the ion-implanted hydrogen has been studied by elastic recoil detection analysis (ERDA) method. The strength of the implanted region after thermal annealings were measured with the crack opening method. The boron implantation before hydrogen implantation resulted to shallower implantation depth and lower splitting temperature than in samples implanted with hydrogen only. The boron implantation after hydrogen implantation did not influence the splitting temperature and RBS spectra showed that B implantation drove the H deeper to the sample

  9. Evaluation of an expence of materials during ion implantation

    International Nuclear Information System (INIS)

    Bannikov, M.G.; Zlobin, N.; Zotov, A.V.; Vasilev, V.I.; Vasilev, I.P.

    2003-01-01

    Ion implantation is used for a surface modification. The implantation dose must be sufficient to obtain the required properties of a processed surface, but should not be exceeded to prevent over-expenditure of implanted materials. The latter is especially important when noble metals are used as an implanted material. The ion implanter includes a vacuum chamber, source of metal ions (target) and a vacuum pumping-out system. Ions of a plasma-forming gas sputter the target and ions of metal are then accelerated and implanted into surface treated. Ion implantation dose can be calculated from operation parameters such as ion beam current density and duration of implanting. The presence of the plasma-forming gas in the ion flow makes it difficult to determine the expenditure of an implanted metal itself. The objective of this paper is the more accurate definition of an expense of an implanted metal. Mass- spectrometric analysis of an ion beam together with the weighing of the target was used to determine the expense of an implanted metal. It was found that, depending on the implantation parameters, on average around 50% of a total ion flow are metal ions. Results obtained allow more precise definition of an implantation dose. Thus, over- expenditure of implanted metals can be eliminated. (author)

  10. ION SOURCES FOR ENERGY EXTREMES OF ION IMPLANTATION.

    Energy Technology Data Exchange (ETDEWEB)

    HERSCHCOVITCH,A.; JOHNSON, B.M.; BATALIN, V.A.; KROPACHEV, G.N.; KUIBEDA, R.P.; KULEVOY, T.V.; KOLOMIETS, A.A.; PERSHIN, V.I.; PETRENKO, S.V.; RUDSKOY, I.; SELEZNEV, D.N.; BUGAEV, A.S.; GUSHENETS, V.I.; LITOVKO, I.V.; OKS, E.M.; YUSHKOV, G. YU.; MASEUNOV, E.S.; POLOZOV, S.M.; POOLE, H.J.; STOROZHENKO, P.A.; SVAROVSKI, YA.

    2007-08-26

    For the past four years a joint research and development effort designed to develop steady state, intense ion sources has been in progress with the ultimate goal to develop ion sources and techniques, which meet the two energy extreme range needs of mega-electron-volt and 100's of electron-volt ion implanters. This endeavor has already resulted in record steady state output currents of high charge state of Antimony and Phosphorous ions: P{sup 2+} (8.6 pmA), P{sup 3+} (1.9 pmA), and P{sup 4+} (0.12 pmA) and 16.2, 7.6, 3.3, and 2.2 pmA of Sb{sup 3+} Sb{sup 4+}, Sb{sup 5+}, and Sb{sup 6+} respectively. For low energy ion implantation our efforts involve molecular ions and a novel plasmaless/gasless deceleration method. To date, 1 emA of positive Decaborane ions were extracted at 10 keV and smaller currents of negative Decaborane ions were also extracted. Additionally, Boron current fraction of over 70% was extracted from a Bemas-Calutron ion source, which represents a factor of 3.5 improvement over currently employed ion sources.

  11. Semiconductor applications of plasma immersion ion implantation ...

    Indian Academy of Sciences (India)

    Unknown

    549. Semiconductor applications of plasma immersion ion implantation technology. MUKESH KUMAR*, RAJKUMAR†, DINESH KUMAR and P J GEORGE. Department of Electronic Science, Kurukshetra University, Kurukshetra 136 119, India. †Semiconductor Complex Ltd., Industrial Area Phase 8, Mohali 160 059, India.

  12. Semiconductor applications of plasma immersion ion implantation ...

    Indian Academy of Sciences (India)

    Home; Journals; Bulletin of Materials Science; Volume 25; Issue 6. Semiconductor applications of plasma immersion ion implantation technology ... Department of Electronic Science, Kurukshetra University, Kurukshetra 136 119, India; Semiconductor Complex Ltd., Industrial Area Phase 8, Mohali 160 059, India ...

  13. Doping of silicon carbide by ion implantation

    International Nuclear Information System (INIS)

    Gimbert, J.

    1999-01-01

    It appeared that in some fields, as the hostile environments (high temperature or irradiation), the silicon compounds showed limitations resulting from the electrical and mechanical properties. Doping of 4H and 6H silicon carbide by ion implantation is studied from a physicochemical and electrical point of view. It is necessary to obtain n-type and p-type material to realize high power and/or high frequency devices, such as MESFETs and Schottky diodes. First, physical and electrical properties of silicon carbide are presented and the interest of developing a process technology on this material is emphasised. Then, physical characteristics of ion implantation and particularly classical dopant implantation, such as nitrogen, for n-type doping, and aluminium and boron, for p-type doping are described. Results with these dopants are presented and analysed. Optimal conditions are extracted from these experiences so as to obtain a good crystal quality and a surface state allowing device fabrication. Electrical conduction is then described in the 4H and 6H-SiC polytypes. Freezing of free carriers and scattering processes are described. Electrical measurements are carried out using Hall effect on Van der Panw test patterns, and 4 point probe method are used to draw the type of the material, free carrier concentrations, resistivity and mobility of the implanted doped layers. These results are commented and compared to the theoretical analysis. The influence of the technological process on electrical conduction is studied in view of fabricating implanted silicon carbide devices. (author)

  14. Plasma immersion ion implantation for reducing metal ion release

    Energy Technology Data Exchange (ETDEWEB)

    Diaz, C.; Garcia, J. A.; Maendl, S.; Pereiro, R.; Fernandez, B.; Rodriguez, R. J. [Centro de Ingenieria Avanzada de Superficies AIN, 31191, Cordovilla-Pamplona (Spain); Leibniz-Institut fuer Oberflaechenmodifizierung, 04318 Leipzig (Germany); Universidad de Oviedo, Departamento Quimica Fisica y Analitica (Spain); Centro de Ingenieria Avanzada de Superficies AIN, 31191, Cordovilla-Pamplona (Spain)

    2012-11-06

    Plasma immersion ion implantation of Nitrogen and Oxygen on CoCrMo alloys was carried out to improve the tribological and corrosion behaviors of these biomedical alloys. In order to optimize the implantation results we were carried experiments at different temperatures. Tribocorrosion tests in bovine serum were used to measure Co, Cr and Mo releasing by using Inductively Coupled Plasma Mass Spectrometry analysis after tests. Also, X-ray Diffraction analysis were employed in order to explain any obtained difference in wear rate and corrosion tests. Wear tests reveals important decreases in rate of more than one order of magnitude for the best treatment. Moreover decreases in metal release were found for all the implanted samples, preserving the same corrosion resistance of the unimplanted samples. Finally this paper gathers an analysis, in terms of implantation parameters and achieved properties for industrial implementation of these treatments.

  15. Development of a microwave ion source for ion implantations

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, N., E-mail: Nbk-Takahashi@shi.co.jp; Murata, H.; Kitami, H.; Mitsubori, H.; Sakuraba, J.; Soga, T.; Aoki, Y.; Katoh, T. [Technology Research Center, Sumitomo Heavy Industries Ltd., Yokosuka, Kanagawa 237-8555 (Japan)

    2016-02-15

    A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P{sup +} beam currents. The volume of the plasma chamber is optimized by varying the length of a boron nitride block installed within the chamber. The extracted P{sup +} beam current is more than 30 mA, at a 25 kV acceleration voltage, using PH{sub 3} gas.

  16. Ion beam sputter implantation method

    International Nuclear Information System (INIS)

    King, W.J.

    1978-01-01

    By means of ion beam atomizing or sputtering an integrally composed coating, the composition of which continuously changes from 100% of the substrate to 100% of the coating, can be surfaced on a substrate (e.g. molten quartz on plastic lenses). In order to do this in the facility there is directed a primary beam of accelerated noble gas ions on a target from the group of the following materials: SiO 2 , Al 2 O 3 , Corning Glass 7070, Corning Glass 7740 or borosilicate glass. The particles leaving the target are directed on the substrate by means of an acceleration potential of up to 10 KV. There may, however, be coated also metal layers (Ni, Co) on a mylar film resulting in a semireflecting metal film. (RW) [de

  17. Range and damage distribution in cluster ion implantation

    International Nuclear Information System (INIS)

    Yamada, I.; Matsuo, J.; Jones, E.C.; Takeuchi, D.; Aoki, T.

    1997-01-01

    Cluster ion implantation is an attractive alternative to conventional ion implantation, particularly for shallow junction formation. It is easy to obtain high current ion beams with low equivalent energy using cluster ion beams. The implanted boron distribution in 5 keV B 10 H 14 implanted Si is markedly shallower than that in 5 keV BF 2 ion implanted Si. The implanted depth is less than 0.04 μm, indicating that cluster ion implantation is capable of forming shallow junctions. The sheet resistance of 3 keV B 10 H 14 implanted samples falls below 500 Ω/sq after annealing at 1,000 C for 10s. Shallow implantation can be realized by a high energy cluster beam without space-charge problems in the incident beam. Defect formation, resulting from local energy deposition and multiple collisions, is unique for cluster ions. The thickness of the damaged layer formed by cluster ion bombardment increases with the size of the cluster, if implant energy and ion dose remain constant. This is one of the nonlinear cluster effects, which may allow some control over the implant damage distributions that accompany implanted ions, and which have been shown to have a great effect on dopant redistribution during annealing

  18. Effects of ion-implantation in magnetic garnet

    International Nuclear Information System (INIS)

    Betsui, Keiichi; Komenou, Kazunari

    1986-01-01

    Ion implantation in magnetic garnet film induces anisotropy field change, ΔH k . The primary origin of the ΔH k is the stress-induced anisotropy, but it was precisely reported that ion-implantation also induces non-magnetostrictive anisotropy change due to the growth-induced anisotropy suppression. The hydrogen ion-implantation induces a large ΔH k due to the chemical effects of the hydrogen in the implanted layer. The ΔH k in ion-implanted garnet is greatly enhanced by exposing implanted films to plasma of hydrogen or rare gases. These large anisotropy changes in hydrogen implantation and plasma exposure are attributed to the change in valence state of Fe-ions. This report reviews these recent developments on ion-implanted garnets. (author)

  19. Amorphous Ge quantum dots embedded in SiO2 formed by low energy ion implantation

    International Nuclear Information System (INIS)

    Zhao, J. P.; Huang, D. X.; Jacobson, A. J.; Chen, Z. Y.; Makarenkov, B.; Chu, W. K.; Bahrim, B.; Rabalais, J. W.

    2008-01-01

    Under ultrahigh vacuum conditions, extremely small Ge nanodots embedded in SiO 2 , i.e., Ge-SiO 2 quantum dot composites, have been formed by ion implantation of 74 Ge + isotope into (0001) Z-cut quartz at a low kinetic energy of 9 keV using varying implantation temperatures. Transmission electron microscopy (TEM) images and micro-Raman scattering show that amorphous Ge nanodots are formed at all temperatures. The formation of amorphous Ge nanodots is different from reported crystalline Ge nanodot formation by high energy ion implantation followed by a necessary high temperature annealing process. At room temperature, a confined spatial distribution of the amorphous Ge nanodots can be obtained. Ge inward diffusion was found to be significantly enhanced by a synergetic effect of high implantation temperature and preferential sputtering of surface oxygen, which induced a much wider and deeper Ge nanodot distribution at elevated implantation temperature. The bimodal size distribution that is often observed in high energy implantation was not observed in the present study. Cross-sectional TEM observation and the depth profile of Ge atoms in SiO 2 obtained from x-ray photoelectron spectra revealed a critical Ge concentration for observable amorphous nanodot formation. The mechanism of formation of amorphous Ge nanodots and the change in spatial distribution with implantation temperature are discussed

  20. Operation of low-energy ion implanters for Si, N, C ion implantation into silicon and glassy carbon

    International Nuclear Information System (INIS)

    Carder, D.A.; Markwitz, A.

    2009-01-01

    This report details the operation of the low-energy ion implanters at GNS Science for C, N and Si implantations. Two implanters are presented, from a description of the components through to instructions for operation. Historically the implanters have been identified with the labels 'industrial' and 'experimental'. However, the machines only differ significantly in the species of ions available for implantation and sample temperature during implantation. Both machines have been custom designed for research purposes, with a wide range of ion species available for ion implantation and the ability to implant two ions into the same sample at the same time from two different ion sources. A fast sample transfer capability and homogenous scanning profiles are featured in both cases. Samples up to 13 mm 2 can be implanted, with the ability to implant at temperatures down to liquid nitrogen temperatures. The implanters have been used to implant 28 Si + , 14 N + and 12 C + into silicon and glassy carbon substrates. Rutherford backscattering spectroscopy has been used to analyse the implanted material. From the data a Si 30 C 61 N 9 layer was measured extending from the surface to a depth of about 77 ± 2 nm for (100) silicon implanted with 12 C + and 14 N + at multiple energies. Silicon and nitrogen ion implantation into glassy carbon produced a Si (40.5 %), C (38 %), N (19.5 %) and O (2%) layer centred around a depth of 50 ± 2 nm from the surface. (author). 8 refs., 20 figs

  1. Quantum effects in ion implanted devices

    International Nuclear Information System (INIS)

    Jamieson, D.N.; Chan, V.; Hudson, F.E.; Andresen, S.E.; Yang, C.; Hopf, T.; Hearne, S.M.; Pakes, C.I.; Prawer, S.; Gauja, E.; Yang, C.; Dzurak, A.S.; Yang, C.; Clark, R.G.; Yang, C.

    2005-01-01

    Fabrication of nanoscale devices that exploit the rules of quantum mechanics to process information presents formidable technical challenges because it will be necessary to control quantum states at the level of individual atoms, electrons or photons. We have developed a pathway to the construction of quantum devices using ion implantation and demonstrate, using charge transport analysis, that the devices exhibit single electron effects. We construct devices that employ two P donors in Si by employing the technique of ion beam induced charge (IBIC) in which single 14 keV P ions can be implanted into ultra-pure silicon by monitoring on-substrate detector electrodes. We have used IBIC with a MeV nuclear microprobe to map and measure the charge collection efficiency in the development of the electrode structure and show that 100% charge collection efficiency can be achieved leading to the fabrication of prototype devices that display quantum effects in the transport of single charge quanta between the islands of implanted donors. (author). 9 refs., 4 figs., 1 tab

  2. Investigation of a quadrupole ultra-high vacuum ion pump

    Science.gov (United States)

    Schwarz, H. J.

    1974-01-01

    The new nonmagnetic ion pump resembles the quadrupole ionization gage. The dimensions are larger, and hyperbolically shaped electrodes replace the four rods. Their surfaces follow y sq. = 36 + x sq. (x, y in centimeters). The electrodes, 55 cm long, are positioned lengthwise in a tube. At one end a cathode emits electrons; at the other end a narrowly wound flat spiral of tungsten clad with titanium on cathode potential can be heated for titanium evaporation. Electrons accelerated by a dc potential of the surface electrodes oscillate between the ends on rotational trajectories, if a high frequency potential superimposed on the dc potential is properly adjusted. Pumping speeds (4-100 liter/sec) for different gases at different peak voltages (1000-3000V) at corresponding frequencies (57-100 MHz), and at different pressures 0.00001 to the minus 9 power Torr were observed. The lowest pressure reached was below 10 to the minus 10 power Torr.

  3. Paramagnetism in ion-implanted oxides

    CERN Document Server

    Mølholt, Torben Esmann; Gíslason, Hafliði Pétur; Ólafsson, Sveinn

    This thesis describes the investigation on para-magnetism in dilute ion-implanted single-crystal oxide samples studied by on- and off-line $^{57}$Fe emission Mössbauer spectroscopy. The ion-implantation of the radioactive isotopes ( $^{57}$Mn and $^{57}$Co) was performed at the ISOLDE facility at CERN in Geneva, Switzerland. The off-line measurements were performed at Aarhus University, Denmark. Mössbauer spectroscopy is a unique method, giving simultaneously local information on valence/spin state of the $^{57}$Fe probe atoms, site symmetry and magnetic properties on an atomic scale. The utilisation of emission Mössbauer spectroscopy opens up many new possibilities compared with traditional transmission Mössbauer spectroscopy. Among them is the possibility of working with a low concentration below 10$^{-4}$ –10$^{-3}$ at.%, where the implanted Mössbauer $^{57}$Fe probes are truly dilute impurities exclusively interacting with their nearest neighbours and therefore the possibility of crea...

  4. Production of Endohedral Fullerenes by Ion Implantation

    Energy Technology Data Exchange (ETDEWEB)

    Diener, M.D.; Alford, J. M.; Mirzadeh, S.

    2007-05-31

    The empty interior cavity of fullerenes has long been touted for containment of radionuclides during in vivo transport, during radioimmunotherapy (RIT) and radioimaging for example. As the chemistry required to open a hole in fullerene is complex and exceedingly unlikely to occur in vivo, and conformational stability of the fullerene cage is absolute, atoms trapped within fullerenes can only be released during extremely energetic events. Encapsulating radionuclides in fullerenes could therefore potentially eliminate undesired toxicity resulting from leakage and catabolism of radionuclides administered with other techniques. At the start of this project however, methods for production of transition metal and p-electron metal endohedral fullerenes were completely unknown, and only one method for production of endohedral radiofullerenes was known. They therefore investigated three different methods for the production of therapeutically useful endohedral metallofullerenes: (1) implantation of ions using the high intensity ion beam at the Oak Ridge National Laboratory (ORNL) Surface Modification and Characterization Research Center (SMAC) and fullerenes as the target; (2) implantation of ions using the recoil energy following alpha decay; and (3) implantation of ions using the recoil energy following neutron capture, using ORNL's High Flux Isotope Reactor (HFIR) as a thermal neutron source. While they were unable to obtain evidence of successful implantation using the ion beam at SMAC, recoil following alpha decay and neutron capture were both found to be economically viable methods for the production of therapeutically useful radiofullerenes. In this report, the procedures for preparing fullerenes containing the isotopes {sup 212}Pb, {sup 212}Bi, {sup 213}Bi, and {sup 177}Lu are described. None of these endohedral fullerenes had ever previously been prepared, and all of these radioisotopes are actively under investigation for RIT. Additionally, the chemistry for

  5. Quantum effects in ion implanted devices

    International Nuclear Information System (INIS)

    Jamieson, D.N.; Chan, V.; Hudson, F.E.; Andresen, S.E.; Yang, C.; Hopf, T.; Hearne, S.M.; Pakes, C.I.; Prawer, S.; Gauja, E.; Dzurak, A.S.; Clark, R.G.

    2006-01-01

    Fabrication of nanoscale devices that exploit the rules of quantum mechanics to process information presents formidable technical challenges because of the need to control quantum states at the level of individual atoms, electrons or photons. We have used ion implantation to fabricate devices on the scale of 10 nm that have allowed the development and test of nanocircuitry for the control of charge transport at the level of single electrons. This fabrication method is compatible with the construction of devices that employ counted P dopants in Si by employing the technique of ion beam induced charge (IBIC) in which single 14 keV P ions can be implanted into ultra-pure silicon substrates by monitoring on-substrate detector electrodes. We have used IBIC with a MeV nuclear microprobe to map and measure the charge collection efficiency in the development of the electrode structure and show that 100% charge collection efficiency can be achieved. Prototype devices fabricated by this method have been used to investigate quantum effects in the control and transport of single electrons with potential applications to solid state quantum information processing devices

  6. Wear properties of metal ion implanted 4140 steel

    International Nuclear Information System (INIS)

    Evans, P.J.; Paoloni, F.J.

    1994-01-01

    AISI type 4140 (high tensile) steel has been implanted with tungsten and titanium using a metal vapour vacuum arc ion source. Doses in the range (1-5)x10 16 ionscm -2 were implanted to a depth of approximately 30nm. The relative wear resistance between non-implanted and implanted specimens has been estimated using pin-on-disc and abrasive wear tests. Implantation of titanium decreased the area of wear tracks by a factor of 5 over unimplanted steel. In some cases the steel was also hardened by a liquid carburization treatment before implantation. Abrasion tests revealed a further improvement in wear resistance on this material following ion irradiation. ((orig.))

  7. Biodegradable radioactive implants for glaucoma filtering surgery produced by ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Assmann, W. [Department fuer Physik, Ludwig-Maximilians-Universitaet Muenchen, 85748 Garching (Germany)]. E-mail: walter.assmann@lmu.de; Schubert, M. [Department fuer Physik, Ludwig-Maximilians-Universitaet Muenchen, 85748 Garching (Germany); Held, A. [Augenklinik, Technische Universitaet Muenchen, 81675 Munich (Germany); Pichler, A. [Augenklinik, Technische Universitaet Muenchen, 81675 Muenchen (Germany); Chill, A. [Zentralinstitut fuer Medizintechnik, Technische Universitaet Muenchen, 85748 Garching (Germany); Kiermaier, S. [Zentralinstitut fuer Medizintechnik, Technische Universitaet Muenchen, 85748 Garching (Germany); Schloesser, K. [Forschungszentrum Karlsruhe, 76021 Karlsruhe (Germany); Busch, H. [NTTF GmbH, 53619 Rheinbreitbach (Germany); Schenk, K. [NTTF GmbH, 53619 Rheinbreitbach (Germany); Streufert, D. [Acri.Tec GmbH, 16761 Hennigsdorf (Germany); Lanzl, I. [Augenklinik, Technische Universitaet Muenchen, 81675 Munich (Germany)

    2007-04-15

    A biodegradable, {beta}-emitting implant has been developed and successfully tested which prevents fresh intraocular pressure increase after glaucoma filtering surgery. Ion implantation has been used to load the polymeric implants with the {beta}-emitter {sup 32}P. The influence of ion implantation and gamma sterilisation on degradation and {sup 32}P-fixation behavior has been studied by ion beam and chemical analysis. Irradiation effects due to the applied ion fluence (10{sup 15} ions/cm{sup 2}) and gamma dose (25 kGy) are found to be tolerable.

  8. Cluster Ion Implantation in Graphite and Diamond

    DEFF Research Database (Denmark)

    Popok, Vladimir

    2014-01-01

    Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite...... and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster...

  9. Ion implanted GaAs microwave FET's

    Science.gov (United States)

    Gill, S. S.; Blockley, E. G.; Dawsey, J. R.; Foreman, B. J.; Woodward, J.; Ball, G.; Beard, S. J.; Gaskell, J. M.; Allenson, M. B.

    1988-06-01

    The combination of ion implantation and photolithographic patterning techniques was applied to the fabrication of GaAs microwave FETs to provide a large number of devices having consistently predictable dc and high frequency characteristics. To validate the accuracy and repeatability of the high frequency device parameters, an X-band microwave circuit was designed and realized. The performance of this circuit, a buffered amplifier, is very close to the design specification. The availability of a large number of reproducible, well-characterized transistors enabled work to commence on the development of a large signal model for FETs. Work in this area is also described.

  10. Electrochemical investigations of ion-implanted oxide films

    International Nuclear Information System (INIS)

    Schultze, J.W.; Danzfuss, B.; Meyer, O.; Stimming, U.

    1985-01-01

    Oxide films (passive films) of 40-50 nm thickness were prepared by anodic polarization of hafnium and titanium electrodes up to 20 V. Multiple-energy ion implantation of palladium, iron and xenon was used in order to obtain modified films with constant concentration profiles of the implanted ions. Rutherford backscattering, X-ray photoelectron spectroscopy measurements and electrochemical charging curves prove the presence of implanted ions, but electrochemical and photoelectrochemical measurements indicate that the dominating effect of ion implantation is the disordering of the oxide film. The capacity of hafnium electrodes increases as a result of an increase in the dielectric constant D. For titanium the Schottky-Mott analysis shows that ion implantation causes an increase in D and the donor concentration N. Additional electronic states in the band gap which are created by the implantation improve the conductivity of the semiconducting or insulating films. This is seen in the enhancement of electron transfer reactions and its disappearance during repassivation and annealing. Energy changes in the band gap are derived from photoelectrochemical measurements; the absorption edge of hafnium oxide films decreases by approximately 2 eV because of ion implantation, but it stays almost constant for titanium oxide films. All changes in electrochemical behavior caused by ion implantation show little variation with the nature of the implanted ion. Hence the dominating effect seems to be a disordering of the oxide. (Auth.)

  11. Polyatomic ions from a high current ion implanter driven by a liquid metal ion source

    Science.gov (United States)

    Pilz, W.; Laufer, P.; Tajmar, M.; Böttger, R.; Bischoff, L.

    2017-12-01

    High current liquid metal ion sources are well known and found their first application as field emission electric propulsion thrusters in space technology. The aim of this work is the adaption of such kind of sources in broad ion beam technology. Surface patterning based on self-organized nano-structures on, e.g., semiconductor materials formed by heavy mono- or polyatomic ion irradiation from liquid metal (alloy) ion sources (LMAISs) is a very promising technique. LMAISs are nearly the only type of sources delivering polyatomic ions from about half of the periodic table elements. To overcome the lack of only very small treated areas by applying a focused ion beam equipped with such sources, the technology taken from space propulsion systems was transferred into a large single-end ion implanter. The main component is an ion beam injector based on high current LMAISs combined with suited ion optics allocating ion currents in the μA range in a nearly parallel beam of a few mm in diameter. Different types of LMAIS (needle, porous emitter, and capillary) are presented and characterized. The ion beam injector design is specified as well as the implementation of this module into a 200 kV high current ion implanter operating at the HZDR Ion Beam Center. Finally, the obtained results of large area surface modification of Ge using polyatomic Bi2+ ions at room temperature from a GaBi capillary LMAIS will be presented and discussed.

  12. SIMS analysis of isotopic impurities in ion implants

    International Nuclear Information System (INIS)

    Sykes, D.E.; Blunt, R.T.

    1986-01-01

    The n-type dopant species Si and Se used for ion implantation in GaAs are multi-isotopic with the most abundant isotope not chosen because of potential interferences with residual gases. SIMS analysis of a range of 29 Si implants produced by several designs of ion implanter all showed significant 28 Si impurity with a different depth distribution from that of the deliberately implanted 29 Si isotope. This effect was observed to varying degrees with all fifteen implanters examined and in every 29 Si implant analysed to date 29 Si + , 29 Si ++ and 30 Si implants all show the same effect. In the case of Se implantation, poor mass resolution results in the implantation of all isotopes with the same implant distribution (i.e. energy), whilst implants carried out with good mass resolution show the implantation of all isotopes with the characteristic lower depth distribution of the impurity isotopes as found in the Si implants. This effect has also been observed in p-type implants into GaAs (Mg) and for Ga implanted in Si. A tentative explanation of the effect is proposed. (author)

  13. A novel method for effective sodium ion implantation into silicon

    Energy Technology Data Exchange (ETDEWEB)

    Lu Qiuyuan; Chu, Paul K. [Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)

    2012-07-15

    Although sodium ion implantation is useful to the surface modification of biomaterials and nano-electronic materials, it is a challenging to conduct effective sodium implantation by traditional implantation methods due to its high chemical reactivity. In this paper, we present a novel method by coupling a Na dispenser with plasma immersion ion implantation and radio frequency discharge. X-ray photoelectron spectroscopy (XPS) depth profiling reveals that sodium is effectively implanted into a silicon wafer using this apparatus. The Na 1s XPS spectra disclose Na{sub 2}O-SiO{sub 2} bonds and the implantation effects are confirmed by tapping mode atomic force microscopy. Our setup provides a feasible way to conduct sodium ion implantation effectively.

  14. Influence of Ro radiation upon ion-implanted MOS structures

    International Nuclear Information System (INIS)

    Kaschieva, S.; Djakov, A.

    1986-01-01

    The interaction of Ro radiation with defects in ion-implanted MOS structures is studied using the method of thermally stimulated charge release and C/V method. It is shown that preliminary treatment with Ro radiation decreases the temperature of thermal annealing of the radiation defects introduced by ion-implantation up to 450 0 C. (author)

  15. Ion implantation induced blistering of rutile single crystals

    Energy Technology Data Exchange (ETDEWEB)

    Xiang, Bing-Xi [School of Physics, Shandong University, Jinan, Shandong 250100 (China); Jiao, Yang [College of Physics and Electronics, Shandong Normal University, Jinan, Shandong 250100 (China); Guan, Jing [School of Physics, Shandong University, Jinan, Shandong 250100 (China); Wang, Lei [School of Physics, Shandong University, Jinan, Shandong 250100 (China); Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences (China)

    2015-07-01

    The rutile single crystals were implanted by 200 keV He{sup +} ions with a series fluence and annealed at different temperatures to investigate the blistering behavior. The Rutherford backscattering spectrometry, optical microscope and X-ray diffraction were employed to characterize the implantation induced lattice damage and blistering. It was found that the blistering on rutile surface region can be realized by He{sup +} ion implantation with appropriate fluence and the following thermal annealing.

  16. Adhesive, abrasive and oxidative wear in ion-implanted metals

    International Nuclear Information System (INIS)

    Dearnaley, G.

    1985-01-01

    Ion implantation is increasingly being used to provide wear resistance in metals and cemented tungsten carbides. Field trials and laboratory tests indicate that the best performance is achieved in mild abrasive wear. This can be understood in terms of the classification of wear modes (adhesive, abrasive, oxidative etc.) introduced by Burwell. Surface hardening and work hardenability are the major properties to be enhanced by ion implantation. The implantation of nitrogen or dual implants of metallic and interstitial species are effective. Recently developed techniques of ion-beam-enhanced deposition of coatings can further improve wear resistance by lessening adhesion and oxidation. In order to support such hard coatings, ion implantation of nitrogen can be used as a preliminary treatment. There is thus emerging a versatile group of related hard vacuum treatments involving intense beams of nitrogen ions for the purpose of tailoring metal surfaces to resist wear. (Auth.)

  17. Electrical properties of polymer modified by metal ion implantation

    International Nuclear Information System (INIS)

    Wu Yuguang; Zhang Tonghe; Zhang Huixing; Zhang Xiaoji; Deng Zhiwei; Zhou Gu

    2000-01-01

    Polyethylene terephthalate (PET) has been modified by Ag, Cr, Cu and Si ion implantation with a dose range from 1x10 16 to 2x10 17 ions cm -2 using a metal vapor vacuum arc (MEVVA) source. The electrical properties of PET have been changed after metal ion implantation. The resistivity of implanted PET decreased obviously with an increase of ion dose. When metal ion dose of 2x10 17 cm -2 was selected, the resistivity of PET could be less than 10 Ω cm, but when Si ions are implanted, the resistivity of PET would be up to several hundred Ω cm. The results show that the conductive behavior of a metal ion implanted sample is obviously different from Si implantation one. The changes of the structure and composition have been observed with transmission electron microscope (TEM) and X-ray diffraction (XRD). The surface structure is varying after ion implantation and it is believed that the change would cause the improvement of the conductive properties. The mechanism of electrical conduction will be discussed

  18. Enhancement of electrical conductivity of ion-implanted polymer films

    International Nuclear Information System (INIS)

    Brock, S.

    1985-01-01

    The electrical conductivity of ion-implanted films of Nylon 66, Polypropylene (PP), Poly(tetrafluoroethylene) (Teflon) and mainly Poly (ethylene terephthalate) (PET) was determined by DC measurements at voltages up to 4500 V and compared with the corresponding values of pristine films. Measurements were made at 21 0 C +/- 1 0 C and 65 +/- 2% RH. The electrical conductivity of PET films implanted with F + , Ar + , or As + ions at energies of 50 keV increases by seven orders of magnitude as the fluence increases from 1 x 10 18 to 1 x 10 20 ions/m 2 . The conductivity of films implanted with As + was approximately one order greater than those implanted with Ar + , which in turn was approximately one-half order greater than those implanted with F + . The conductivity of the most conductive film ∼1 S/m) was almost 14 orders of magnitude greater than the pristine PET film. Except for the three PET samples implanted at fluences near 1 x 10 20 ions/m 2 with F + , Ar + , and As + ions, all implanted films were ohmic up to an electric field strength of 600 kV/m. The temperature dependence of the conductivity of the three PET films implanted near a fluence of 1 x 10 20 ions/m 2 was measured over the range of 80 K < T < 300 K

  19. Thin hydroxyapatite surface layers on titanium produced by ion implantation

    CERN Document Server

    Baumann, H; Bilger, G; Jones, D; Symietz, I

    2002-01-01

    In medicine metallic implants are widely used as hip replacement protheses or artificial teeth. The biocompatibility is in all cases the most important requirement. Hydroxyapatite (HAp) is frequently used as coating on metallic implants because of its high acceptance by the human body. In this paper a process is described by which a HAp surface layer is produced by ion implantation with a continuous transition to the bulk material. Calcium and phosphorus ions are successively implanted into titanium under different vacuum conditions by backfilling oxygen into the implantation chamber. Afterwards the implanted samples are thermally treated. The elemental composition inside the implanted region was determined by nuclear analysis methods as (alpha,alpha) backscattering and the resonant nuclear reaction sup 1 H( sup 1 sup 5 N,alpha gamma) sup 1 sup 2 C. The results of X-ray photoelectron spectroscopy indicate the formation of HAp. In addition a first biocompatibility test was performed to compare the growing of m...

  20. Metal ion implantation using a filtered cathodic vacuum arc

    Science.gov (United States)

    Bilek, M. M. M.; Evans, P.; Mckenzie, D. R.; McCulloch, D. G.; Zreiqat, H.; Howlett, C. R.

    2000-05-01

    When plasma immersion ion implantation is performed in the condensable plasma stream produced by a cathodic vacuum arc, deposition as well as implantation usually occurs. In this article we describe a method of achieving pure implantation by orienting the substrate so that it is shadowed from the plasma beam. Implantation depth profiles measured in glassy carbon and CR39 polymer using Rutherford backscattering are compared to illustrate the effectiveness of the technique for conducting and insulating substrates. Charging of the insulating substrate was found to cause a reduction in implantation depth compared to a conducting substrate. The depth profiles in glassy carbon were comparable to those achieved by conventional extracted ion beam implantation. Implantation of magnesium into hydroxyapatite and alumina was carried out to improve the bone cell adhesion onto these materials for prosthetic applications.

  1. Cytological effect of nitrogen ion implantation into Stevia

    International Nuclear Information System (INIS)

    Shen Mei; Wang Cailian; Chen Qiufang; Lu Ting; Shu Shizhen

    1997-01-01

    Dry seeds of Stevia were implanted by 35∼150 keV nitrogen ion with various doses. The cytological effect on M 1 was studied. The results showed that nitrogen ion beam was able to induce variation on chromosome structure in root tip cells. The rate of cells with chromosome aberration was increased with the increased with the increase of ion beam energy and dose. However, there was no significant linear regression relationship between ion dose and aberration rate. The cytological effect of nitrogen ion implantation was lower than that of γ-rays

  2. Modification of the hydriding of uranium using ion implantation

    International Nuclear Information System (INIS)

    Musket, R.G.; Robinson-Weis, G.; Patterson, R.G.

    1983-01-01

    The hydriding of depleted uranium at 76 Torr hydrogen and 130 0 C has been significantly reduced by implantation of oxygen ions. The high-dose implanted specimens had incubation times for the initiation of the reaction after exposure to hydrogen that exceeded those of the nonimplanted specimens by more than a factor of eight. Furthermore, the nonimplanted specimens consumed enough hydrogen to cause macroscopic flaking of essentially the entire surface in times much less than the incubation time for the high-dose implanted specimens. In contrast, the ion-implanted specimens reacted only at isolated spots with the major fraction of the surface area unaffected by the hydrogen exposure

  3. Modification of medical metals by ion implantation of copper

    Science.gov (United States)

    Wan, Y. Z.; Xiong, G. Y.; Liang, H.; Raman, S.; He, F.; Huang, Y.

    2007-10-01

    The effect of copper ion implantation on the antibacterial activity, wear performance and corrosion resistance of medical metals including 317 L of stainless steels, pure titanium, and Ti-Al-Nb alloy was studied in this work. The specimens were implanted with copper ions using a MEVVA source ion implanter with ion doses ranging from 0.5 × 10 17 to 4 × 10 17 ions/cm 2 at an energy of 80 keV. The antibacterial effect, wear rate, and inflexion potential were measured as a function of ion dose. The results obtained indicate that copper ion implantation improves the antibacterial effect and wear behaviour for all the three medical materials studied. However, corrosion resistance decreases after ion implantation of copper. Experimental results indicate that the antibacterial property and corrosion resistance should be balanced for medical titanium materials. The marked deteriorated corrosion resistance of 317 L suggests that copper implantation may not be an effective method of improving its antibacterial activity.

  4. Plasma source ion implantation research at southwestern institute of physics

    International Nuclear Information System (INIS)

    Shang Zhenkui; Geng Man; Tong Honghui

    1997-10-01

    The PSII-EX device and PSII-IM device for research and development of plasma source ion implantation (PSII) technology are described briefly. The functions, main technical specifications and properties of the devices are also discussed. After ion implantation by PSII, the improvements of the surface-mechanical properties (such as microhardness, wear-resistance, friction factor, biological compatibility, etc) for some materials, microanalysis and numerical simulation of modified layers of materials, the technical developments for the practical workpiece treatments and the preliminary experiments for plasma source ion implantation-enhanced deposition are introduced too. As last, the future work about PSII have been proposed

  5. Modification of polyvinyl alcohol surface properties by ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Pukhova, I.V., E-mail: ivpuhova@mail.ru [National Research Tomsk State University, 36 Lenin Ave, Tomsk 634050 (Russian Federation); Institute of High Current Electronics, 2/3 Akademichesky Ave, Tomsk 634055 (Russian Federation); Kurzina, I.A. [National Research Tomsk State University, 36 Lenin Ave, Tomsk 634050 (Russian Federation); Savkin, K.P. [Institute of High Current Electronics, 2/3 Akademichesky Ave, Tomsk 634055 (Russian Federation); Laput, O.A. [National Research Tomsk Polytechnic University, 30 Lenin Ave, Tomsk 634050 (Russian Federation); Oks, E.M. [Institute of High Current Electronics, 2/3 Akademichesky Ave, Tomsk 634055 (Russian Federation)

    2017-05-15

    We describe our investigations of the surface physicochemical properties of polyvinyl alcohol modified by silver, argon and carbon ion implantation to doses of 1 × 10{sup 14}, 1 × 10{sup 15} and 1 × 10{sup 16} ion/cm{sup 2} and energies of 20 keV (for C and Ar) and 40 keV (for Ag). Infrared spectroscopy (IRS) indicates that destructive processes accompanied by chemical bond (−C=O) generation are induced by implantation, and X-ray photoelectron spectroscopy (XPS) analysis indicates that the implanted silver is in a metallic Ag3d state without stable chemical bond formation with polymer chains. Ion implantation is found to affect the surface energy: the polar component increases while the dispersion part decreases with increasing implantation dose. Surface roughness is greater after ion implantation and the hydrophobicity increases with increasing dose, for all ion species. We find that ion implantation of Ag, Ar and C leads to a reduction in the polymer microhardness by a factor of five, while the surface electrical resistivity declines modestly.

  6. Development of vertical compact ion implanter for gemstones applications

    International Nuclear Information System (INIS)

    Intarasiri, S.; Wijaikhum, A.; Bootkul, D.; Suwannakachorn, D.; Tippawan, U.; Yu, L.D.; Singkarat, S.

    2014-01-01

    Ion implantation technique was applied as an effective non-toxic treatment of the local Thai natural corundum including sapphires and rubies for the enhancement of essential qualities of the gemstones. Energetic oxygen and nitrogen ions in keV range of various fluences were implanted into the precious stones. It has been thoroughly proved that ion implantation can definitely modify the gems to desirable colors together with changing their color distribution, transparency and luster properties. These modifications lead to the improvement in quality of the natural corundum and thus its market value. Possible mechanisms of these modifications have been proposed. The main causes could be the changes in oxidation states of impurities of transition metals, induction of charge transfer from one metal cation to another and the production of color centers. For these purposes, an ion implanter of the kind that is traditionally used in semiconductor wafer fabrication had already been successfully applied for the ion beam bombardment of natural corundum. However, it is not practical for implanting the irregular shape and size of gem samples, and too costly to be economically accepted by the gem and jewelry industry. Accordingly, a specialized ion implanter has been requested by the gem traders. We have succeeded in developing a prototype high-current vertical compact ion implanter only 1.36 m long, from ion source to irradiation chamber, for these purposes. It has been proved to be very effective for corundum, for example, color improvement of blue sapphire, induction of violet sapphire from low value pink sapphire, and amelioration of lead-glass-filled rubies. Details of the implanter and recent implantation results are presented

  7. Development of vertical compact ion implanter for gemstones applications

    Energy Technology Data Exchange (ETDEWEB)

    Intarasiri, S., E-mail: saweat@gmail.com [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Wijaikhum, A. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Bootkul, D., E-mail: mo_duangkhae@hotmail.com [Department of General Science (Gems and Jewelry), Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Suwannakachorn, D.; Tippawan, U.; Yu, L.D.; Singkarat, S. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand)

    2014-08-15

    Ion implantation technique was applied as an effective non-toxic treatment of the local Thai natural corundum including sapphires and rubies for the enhancement of essential qualities of the gemstones. Energetic oxygen and nitrogen ions in keV range of various fluences were implanted into the precious stones. It has been thoroughly proved that ion implantation can definitely modify the gems to desirable colors together with changing their color distribution, transparency and luster properties. These modifications lead to the improvement in quality of the natural corundum and thus its market value. Possible mechanisms of these modifications have been proposed. The main causes could be the changes in oxidation states of impurities of transition metals, induction of charge transfer from one metal cation to another and the production of color centers. For these purposes, an ion implanter of the kind that is traditionally used in semiconductor wafer fabrication had already been successfully applied for the ion beam bombardment of natural corundum. However, it is not practical for implanting the irregular shape and size of gem samples, and too costly to be economically accepted by the gem and jewelry industry. Accordingly, a specialized ion implanter has been requested by the gem traders. We have succeeded in developing a prototype high-current vertical compact ion implanter only 1.36 m long, from ion source to irradiation chamber, for these purposes. It has been proved to be very effective for corundum, for example, color improvement of blue sapphire, induction of violet sapphire from low value pink sapphire, and amelioration of lead-glass-filled rubies. Details of the implanter and recent implantation results are presented.

  8. Development of vertical compact ion implanter for gemstones applications

    Science.gov (United States)

    Intarasiri, S.; Wijaikhum, A.; Bootkul, D.; Suwannakachorn, D.; Tippawan, U.; Yu, L. D.; Singkarat, S.

    2014-08-01

    Ion implantation technique was applied as an effective non-toxic treatment of the local Thai natural corundum including sapphires and rubies for the enhancement of essential qualities of the gemstones. Energetic oxygen and nitrogen ions in keV range of various fluences were implanted into the precious stones. It has been thoroughly proved that ion implantation can definitely modify the gems to desirable colors together with changing their color distribution, transparency and luster properties. These modifications lead to the improvement in quality of the natural corundum and thus its market value. Possible mechanisms of these modifications have been proposed. The main causes could be the changes in oxidation states of impurities of transition metals, induction of charge transfer from one metal cation to another and the production of color centers. For these purposes, an ion implanter of the kind that is traditionally used in semiconductor wafer fabrication had already been successfully applied for the ion beam bombardment of natural corundum. However, it is not practical for implanting the irregular shape and size of gem samples, and too costly to be economically accepted by the gem and jewelry industry. Accordingly, a specialized ion implanter has been requested by the gem traders. We have succeeded in developing a prototype high-current vertical compact ion implanter only 1.36 m long, from ion source to irradiation chamber, for these purposes. It has been proved to be very effective for corundum, for example, color improvement of blue sapphire, induction of violet sapphire from low value pink sapphire, and amelioration of lead-glass-filled rubies. Details of the implanter and recent implantation results are presented.

  9. Study on surface modification of M2 steel induced by Cu ions and Al ions implantation

    International Nuclear Information System (INIS)

    Wang Chao; Liu Zhengmin

    2001-01-01

    Changes of surface hardness and wear resistances in M2 type steel implanted by Cu Al ions were reported. The dependence of surface strengthening on ion species and dose was studied by X-ray diffraction (XRD) and Rutherford Backscattering Spectroscopy (RBS) for microhardness and wear resistances measurement. It is shown that both hardness and wear resistance increases apparently after ion implantation. XRD analysis indicates that different phases formed after Al Cu ions implanted. It is also suggested that Cu, Al ions have different role in surface strengthening

  10. Ion implantation induced nanotopography on titanium and bone cell adhesion

    Energy Technology Data Exchange (ETDEWEB)

    Braceras, Iñigo, E-mail: inigo.braceras@tecnalia.com [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (Ciber-BBN) (Spain); Vera, Carolina; Ayerdi-Izquierdo, Ana [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (Ciber-BBN) (Spain); Muñoz, Roberto [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); Lorenzo, Jaione; Alvarez, Noelia [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (Ciber-BBN) (Spain); Maeztu, Miguel Ángel de [Private Practice, P° San Francisco, 43 A-1°, 20400 Tolosa (Spain)

    2014-08-15

    Graphical abstract: Titanium surfaces modified by inert ion implantation affect cell adhesion through modification of the nanotopography in the same dimensional range of that of human bone inorganic phases. - Highlights: • Inert ion implantation on Ti modifies surface nanotopography and bone cell adhesion. • Ion implantation can produce nanostructured surfaces on titanium in the very same range as of those of the mineral phase of the human bone. • Appropriate tool for studying the relevance of nanostructured surfaces on bone mineralization and implant osseointegration. • Ion implantation induced nanotopography have a statistically significant influence on bone cell adhesion. - Abstract: Permanent endo-osseous implants require a fast, reliable and consistent osseointegration, i.e. intimate bonding between bone and implant, so biomechanical loads can be safely transferred. Among the parameters that affect this process, it is widely admitted that implant surface topography, surface energy and composition play an important role. Most surface treatments to improve osseointegration focus on micro-scale features, as few can effectively control the effects of the treatment at nanoscale. On the other hand, ion implantation allows controlling such nanofeatures. This study has investigated the nanotopography of titanium, as induced by different ion implantation surface treatments, its similarity with human bone tissue structure and its effect on human bone cell adhesion, as a first step in the process of osseointegration. The effect of ion implantation treatment parameters such as energy (40–80 keV), fluence (1–2 e17 ion/cm{sup 2}) and ion species (Kr, Ar, Ne and Xe) on the nanotopography of medical grade titanium has been measured and assessed by AFM and contact angle. Then, in vitro tests have been performed to assess the effect of these nanotopographies on osteoblast adhesion. The results have shown that the nanostructure of bone and the studied ion implanted

  11. Ion implantation induced nanotopography on titanium and bone cell adhesion

    International Nuclear Information System (INIS)

    Braceras, Iñigo; Vera, Carolina; Ayerdi-Izquierdo, Ana; Muñoz, Roberto; Lorenzo, Jaione; Alvarez, Noelia; Maeztu, Miguel Ángel de

    2014-01-01

    Graphical abstract: Titanium surfaces modified by inert ion implantation affect cell adhesion through modification of the nanotopography in the same dimensional range of that of human bone inorganic phases. - Highlights: • Inert ion implantation on Ti modifies surface nanotopography and bone cell adhesion. • Ion implantation can produce nanostructured surfaces on titanium in the very same range as of those of the mineral phase of the human bone. • Appropriate tool for studying the relevance of nanostructured surfaces on bone mineralization and implant osseointegration. • Ion implantation induced nanotopography have a statistically significant influence on bone cell adhesion. - Abstract: Permanent endo-osseous implants require a fast, reliable and consistent osseointegration, i.e. intimate bonding between bone and implant, so biomechanical loads can be safely transferred. Among the parameters that affect this process, it is widely admitted that implant surface topography, surface energy and composition play an important role. Most surface treatments to improve osseointegration focus on micro-scale features, as few can effectively control the effects of the treatment at nanoscale. On the other hand, ion implantation allows controlling such nanofeatures. This study has investigated the nanotopography of titanium, as induced by different ion implantation surface treatments, its similarity with human bone tissue structure and its effect on human bone cell adhesion, as a first step in the process of osseointegration. The effect of ion implantation treatment parameters such as energy (40–80 keV), fluence (1–2 e17 ion/cm 2 ) and ion species (Kr, Ar, Ne and Xe) on the nanotopography of medical grade titanium has been measured and assessed by AFM and contact angle. Then, in vitro tests have been performed to assess the effect of these nanotopographies on osteoblast adhesion. The results have shown that the nanostructure of bone and the studied ion implanted

  12. Structural, electrical and catalytic properties of ion-implanted oxides

    NARCIS (Netherlands)

    van Hassel, B.A.; Burggraaf, A.J.

    1989-01-01

    The potential application of ion implantation to modify the surfaces of ceramic materials is discussed. Changes in the chemical composition and microstructure result in important variations of the electrical and catalytic properties of oxides.

  13. Structural and electronic properties of ion-implanted superconductors

    International Nuclear Information System (INIS)

    Bernas, H.; Nedellec, P.

    1980-01-01

    Recent work on ion implanted superconductors is reviewed. In situ x-ray, channeling, resistivity, and electron tunneling experiments now approach the relation between lattice order (or disorder) and superconductivity

  14. Industrial applications of ion implantation into metal surfaces

    International Nuclear Information System (INIS)

    Williams, J.M.

    1987-07-01

    The modern materials processing technique, ion implantation, has intriguing and attractive features that stimulate the imaginations of scientists and technologists. Success of the technique for introducing dopants into semiconductors has resulted in a stable and growing infrastructure of capital equipment and skills for use of the technique in the economy. Attention has turned to possible use of ion implantation for modification of nearly all surface related properties of materials - optical, chemical and corrosive, tribological, and several others. This presentation provides an introduction to fundamental aspects of equipment, technique, and materials science of ion implantation. Practical and economic factors pertaining to the technology are discussed. Applications and potential applications are surveyed. There are already available a number of ion-implanted products, including ball-and-roller bearings and races, punches-and-dies, injection screws for plastics molding, etc., of potential interest to the machine tool industry

  15. Modelling of ion implantation in SiC crystals

    Energy Technology Data Exchange (ETDEWEB)

    Chakarov, Ivan [SILVACO International, 4701 Patrick Henry Drive, Building 2, Santa Clara, CA 95054 (United States)]. E-mail: ivan.chakarov@silvaco.com; Temkin, Misha [SILVACO International, 4701 Patrick Henry Drive, Building 2, Santa Clara, CA 95054 (United States)

    2006-01-15

    An advanced electronic stopping model for ion implantation in SiC has been implemented within the binary collision approximation. The model has been thoroughly tested and validated for Al implantation into 4H-, 6H-SiC under different initial implant conditions. A very good agreement between calculated and experimental profiles has been achieved. The model has been integrated in an industrial technology CAD process simulator.

  16. Modelling of ion implantation in SiC crystals

    International Nuclear Information System (INIS)

    Chakarov, Ivan; Temkin, Misha

    2006-01-01

    An advanced electronic stopping model for ion implantation in SiC has been implemented within the binary collision approximation. The model has been thoroughly tested and validated for Al implantation into 4H-, 6H-SiC under different initial implant conditions. A very good agreement between calculated and experimental profiles has been achieved. The model has been integrated in an industrial technology CAD process simulator

  17. Modification of polyethyleneterephtalate by implantation of nitrogen ions

    International Nuclear Information System (INIS)

    Svorcik, V.; Endrst, R.; Rybka, V.; Hnatowicz, V.; Cerny, F.

    1994-01-01

    The implantation of 90 keV N + ions into polyethyleneterephtalate (PET) to fluences of 1 x 10 14 --1 x 10 17 cm -2 was studied. The changes in electrical sheet conductivity and polarity of ion-exposed PET were observed and the structural changes were examined using IR spectroscopy. One degradation process is a chain fission according to the Norrish II reaction. The sheet conductivity due to conjugated double bonds was increased by ten orders of magnitude as a result of ion implantation. The surface polarity of the PET samples increases slightly with increasing ion fluence

  18. SIMPLANT: analytic calculation of ion implantation within the Tadpance system

    International Nuclear Information System (INIS)

    Fawcett, R.J.

    1988-04-01

    An analytic method for calculating the concentration distribution of dopant atoms introduced into a multilayer semiconductor device by ion beam implantation is explained. Computer software written to apply the method is described. The operation of the software within a semiconductor process and device modelling package is outlined. Implantation distributions generated by the software are illustrated. (author)

  19. Properties and applications of ion-implanted alloys

    International Nuclear Information System (INIS)

    Myers, S.M.

    1979-01-01

    Ion implantation is a controlled and versatile means for near-surface alloying of metals. Supersaturated solutions, metastable compounds, amorphous phases, and equilibrium alloys have been produced. Uses include the investigation of new metastable phases, characterization of alloying reactions occurring in conventional materials, and improvement of surface properties such as hardness, wear, and corrosion. A brief review is given of the physical processes occurring during ion implantation, the types of alloys which result, and representative applications

  20. Development of industrial ion implantation and ion assisted coating processes: A perspective

    International Nuclear Information System (INIS)

    Legg, K.O.; Solnick-Legg, H.

    1989-01-01

    Ion beam processes have gone through a series of developmental stages, from being the mainstay of the semiconductor industry for production of integrated circuits, to new commercial processes for biomedical, aerospace and other industries. Although research is still continuing on surface modification using ion beam methods, ion implantation and ion assisted coatings for treatment of metals, ceramics, polymers and composites must now be considered viable industrial processes of benefit in a wide variety of applications. However, ion implantation methods face various barriers to acceptability, in terms not only of other surface treatment processes, but for implantation itself. This paper will discuss some of the challenges faced by a small company whose primary business is development and marketing of ion implantation and ion-assisted coating processes. (orig.)

  1. Channel waveguides formed by ion implantation of PECVD grown silica

    International Nuclear Information System (INIS)

    Leech, P.W.; Faith, M.F.; Johnson, C.M.; Ridgway, M.C.; Bazylenko, M.

    1997-01-01

    Low loss channel waveguides have been formed in silica-on-silicon by implantation with 5 MeV Si and Ge ions. In these experiments, the substrate was comprised of an undoped layer of silica (30 μm thick) which was grown by plasma enhanced chemical vapour deposition (PECVD). The optical loss characteristics of the waveguides, as measured at both λ 1300 and 1550 nm, were independent of the implanted ion species. A minimum in the attenuation loss (α) of ∼0.10-0.20 dB/cm was obtained following both a pre-implant (1050 o C) and a post-implant (400-500 o C) anneal of the waveguides. The ability to produce a minimum in α by pre-implant annealing has been attributed to the thermally induced relaxation of the densified structure in the as-grown layer. Only a comparatively small degree of compaction was measured for Si-implanted samples which did not receive a pre-implant anneal. In contrast, the much larger degree of compaction in the pre-implant annealed samples was similar in magnitiude to that observed in fused silica. These are the first reported examples of ion-implanted waveguides using a substrate of silica grown by PECVD. (author)

  2. Enhanced Physicochemical and Biological Properties of Ion-Implanted Titanium Using Electron Cyclotron Resonance Ion Sources

    Directory of Open Access Journals (Sweden)

    Csaba Hegedűs

    2016-01-01

    Full Text Available The surface properties of metallic implants play an important role in their clinical success. Improving upon the inherent shortcomings of Ti implants, such as poor bioactivity, is imperative for achieving clinical use. In this study, we have developed a Ti implant modified with Ca or dual Ca + Si ions on the surface using an electron cyclotron resonance ion source (ECRIS. The physicochemical and biological properties of ion-implanted Ti surfaces were analyzed using various analytical techniques, such as surface analyses, potentiodynamic polarization and cell culture. Experimental results indicated that a rough morphology was observed on the Ti substrate surface modified by ECRIS plasma ions. The in vitro electrochemical measurement results also indicated that the Ca + Si ion-implanted surface had a more beneficial and desired behavior than the pristine Ti substrate. Compared to the pristine Ti substrate, all ion-implanted samples had a lower hemolysis ratio. MG63 cells cultured on the high Ca and dual Ca + Si ion-implanted surfaces revealed significantly greater cell viability in comparison to the pristine Ti substrate. In conclusion, surface modification by electron cyclotron resonance Ca and Si ion sources could be an effective method for Ti implants.

  3. Prospects of ion implantation and ion beam mixing for corrosion protection

    International Nuclear Information System (INIS)

    Wolf, G.K.; Munn, P.; Ensinger, W.

    1985-01-01

    Ion implantation is very useful new low temperature treatment for improving the mechanical surface properties of materials without any dimensional changes. In addition also the corrosion properties of metals can be modified considerably by this technique. The long term corrosion behaviour of implanted metals, however, has been studied only for a very limited number of cases. In this contribution a survey of attempts to do this will be presented. As examples of promising systems for corrosion protection by ion beams iron, steel and titanium were examined with and without pretreatment by ion implantation and ion beam mixing. The corrosion rates of the systems have been obtained by neutron activation analysis and by electrochemical methods. Experimental results are presented on: Palladium implanted in titanium - crevice corrosion in salt solution; Palladium implanted in and deposited on titanium -corrosion in sulfuric acid; Platinum implanted in stainless steel -corrosion in sulfuric acid. (author)

  4. Conduction in ion implanted single crystal diamond

    International Nuclear Information System (INIS)

    Hunn, J.D.; Parikh, N.R.; Swanson, M.L.

    1992-01-01

    We have implanted sodium, phosphorus and arsenic into single crystal type IIa diamond as possible n-type dopants. Particular emphasis was applied to the implantation of sodium at different temperatures and doses; combined implantation energies of 55,80 and 120 keV were used to provide a uniformly doped layer over approximately 100 nm depth. The implanted layers exhibited semiconducting behavior with a single exponential activation energy between 0.40 and 0.48 eV, as determined by temperature dependent resistance measurements. A sample implanted to a concentration of 5.10 19 Na + /cm 3 at 550 degrees C exhibited a single activation energy of 0.415 eV over a temperature range from 25 to 500 degrees C. Thermal annealing above 900 degrees C was found to remove implantation damage as measured by optical absorption and RBS/channeling. However, concomitant increases in the resistance and the activation energy were observed. Implantation of 22 Ne was used to introduce a damage density equivalent to the 23 Na implant, while not introducing an electrically active species. The activation energy and electrical resistance were similar but higher than those produced by implantation with sodium. We conclude that the electrical properties of the Na-implanted samples were at least partly due to electrically active Na, but that residual implantation damage was still important

  5. Effective implantation of light emitting centers by plasma immersion ion implantation and focused ion beam methods into nanosized diamond

    International Nuclear Information System (INIS)

    Himics, L.; Tóth, S.; Veres, M.; Tóth, A.; Koós, M.

    2015-01-01

    Highlights: • Characteristics of nitrogen implantation of nanodiamond using two low ion energy ion implantation methods were compared. • Formation of complex nitrogen-related defect centers was promoted by subsequent helium implantation and heat treatments. • Depth profiles of the implanted ions and the generated vacancies were determined using SRIM calculations. • The presence of nitrogen impurity was demonstrated by Fourier-transform infrared spectroscopic measurements. • A new nitrogen related band was detected in the photoluminescence spectrum of the implanted samples that was attributed to the N3 color center in nanodiamond. - Abstract: Two different implantation techniques, plasma immersion ion implantation and focused ion beam, were used to introduce nitrogen ions into detonation nanodiamond crystals with the aim to create nitrogen-vacancy related optically active centers of light emission in near UV region. Previously samples were subjected to a defect creation process by helium irradiation in both cases. Heat treatments at different temperatures (750 °C, 450 °C) were applied in order to initiate the formation of nitrogen-vacancy related complex centers and to decrease the sp 2 carbon content formed under different treatments. As a result, a relatively narrow and intensive emission band with fine structure at 2.98, 2.83 and 2.71 eV photon energies was observed in the light emission spectrum. It was assigned to the N3 complex defect center. The formation of this defect center can be expected by taking into account the relatively high dose of implanted nitrogen ions and the overlapped depth distribution of vacancies and nitrogen. The calculated depth profiles distribution for both implanted nitrogen and helium by SRIM simulation support this expectation

  6. A collisional model for plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Vahedi, V.; Lieberman, M.A.; Alves, M.V.; Verboncoeur, J.P.; Birdsall, C.K.

    1990-01-01

    In plasma immersion ion implantation, a target is immersed in a plasma and a series of negative short pulses are applied to it to implant the ions. A new analytical model is being developed for the high pressure regimes in which the motion of the ions is highly collisional. The model provides values for ion flux, average ion velocity at the target, and sheath edge motion as a function of time. These values are being compared with those obtained from simulation and show good agreement. A review is also given (for comparison) of the earlier work done at low pressures, where the motion of ions in the sheath is collisionless, also showing good agreement between analysis and simulation. The simulation code is PDP1 which utilizes particle-in-cell techniques plus Monte-Carlo simulation of electron-neutral (elastic, excitation and ionization) and ion-neutral (scattering and charge-exchange) collisions

  7. Thermal stress resistance of ion implanted sapphire crystals

    International Nuclear Information System (INIS)

    Gurarie, V.N.; Jamieson, D.N.; Szymanski, R.; Orlov, A.V.; Williams, J.S.; Conway, M.

    1999-01-01

    Monocrystals of sapphire have been subjected to ion implantation with 86 keV Si - and 80 keV Cr - ions to doses in the range of 5x10 14 -5x10 16 cm -2 prior to thermal stress testing in a pulsed plasma. Above a certain critical dose ion implantation is shown to modify the near-surface structure of samples by introducing damage, which makes crack nucleation easier under the applied stress. The effect of ion dose on the stress resistance is investigated and the critical doses which produce a noticeable change in the stress resistance are determined. The critical dose for Si ions is shown to be much lower than that for Cr - ions. However, for doses exceeding 2x10 16 cm -2 the stress resistance parameter decreases to approximately the same value for both implants. The size of the implantation-induced crack nucleating centers and the density of the implantation-induced defects are considered to be the major factors determining the stress resistance of sapphire crystals irradiated with Si - and Cr - ions

  8. Characterization of surface enhancement of carbon ion-implanted TiN coatings by metal vapor vacuum arc ion implantation

    CERN Document Server

    Chang, C L

    2002-01-01

    The modification of the surfaces of energetic carbon-implanted TiN films using metal vapor vacuum arc (MEVVA) ion implantation was investigated, by varying ion energy and dose. The microhardness, microstructure and chemical states of carbon, implanted on the surface layer of TiN films, were examined, as functions of ion energy and dose, by nanoindenter, transmission electron microscopy, Auger electron spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. Results revealed that the microhardness increased from 16.8 up to 25.3 GPa and the friction coefficient decreased to approximately 0.2, depending on the implanted ion energy and dose. The result is attributed to the new microcrystalline phases of TiCN and TiC formed, and carbon concentration saturation of the implanted matrix can enhance the partial mechanical property of TiN films after MEVVA treatment. The concentration distribution, implantation depth and chemical states of carbon-implanted TiN coatings depended strongly on the ion dose and...

  9. Nitrogen ion implantation effect on friction coefficient of tool steel

    International Nuclear Information System (INIS)

    Velichko, N.I.; Udovenko, V.F.; Markus, A.M.; Presnyakova, G.N.; Gamulya, G.D.

    1988-01-01

    Effect of nitrogen molecular ion implantation into KhVSG steel on the friction coefficient in the air and vacuum is investigated. Irradiation is carried out by the N 2 + beam with energy 120 keV and flux density 5 μ/cm 2 at room temperature in vacuum 5x10 -4 Pa. The integral dose of irradiation is 10 17 particle/cm 2 . Nitrogen ion implantation is shown to provide the formation of the modified layer changing friction properties of steel. The friction coefficient can either increase or decrease depending on implantation and test conditions. 4 refs.; 2 figs

  10. Techniques for the implantation of ions in microelectronics. A review

    International Nuclear Information System (INIS)

    Calleja, W.; Aceves, M.; Linares, M.; Fuentes, S.; Fuentes, I.; Landa, M.; Zuniga, C.; Remolina, J.; Peykov, P.

    1991-01-01

    The technique of ion implantation in the field of microelectronics is indispensable as tool for introducing dopant atoms in a semiconductor material surface. It is possible with sophisticated equipment for selecting and accelerating particle to control precisely the electronic behavior of devices and integrated circuits. At National Institute of Astrophysics, Optics and Electronics a process has been developed for fabrication Metal Oxide Silicon integrated circuits which utilized a medium powered ion implanter. In this work a review is given of the functions of a basic implanter which is required in making electronic devices and the technique we developed in the department of microelectronics at National Institute of Astrophysics, Optics and Electronics. (Author)

  11. Surface energy absorbing layers produced by ion implantation

    International Nuclear Information System (INIS)

    Gurarie, V.N.

    1997-01-01

    Single crystals of magnesia have been ion implanted with 80 keV Si and Cr ions at variable doses and then subjected to testing in a shock plasma. The peak surface temperature has been calibrated by measuring the size and temperature deformation of the fragments formed by multiple microcracking during thermal shock. the crack density curves for MgO crystals demonstrate that in a wide range of thermal shock intensity the ion implanted crystals develop a system of microcracks of a considerably higher density than the unimplanted ones. The high density of cracks nucleated in the ion implanted samples results in the formation of a surface energy absorbing layer which effectively absorbs elastic strain energy induced by thermal shock. As a consequence the depth of crack penetration in the layer and hence the degree of fracture damage are decreased. the results indicate that a Si implant decreases the temperature threshold of cracking and simultaneously increases the crack density in MgO crystals. However, in MgO crystals implanted with Cr a substantial increase in the crack density is achieved without a noticeable decrease in the temperature threshold of fracture. This effect is interpreted in terms of different Cr and Si implantation conditions and damage. The mechanical properties of the energy-absorbing layer and the relation to implantation-induced lattice damage are discussed. 11 refs., 4 figs

  12. Positron annihilation study on defects in ion-implanted Si

    International Nuclear Information System (INIS)

    Akahane, T.; Fujinami, M.; Sawada, T.

    2003-01-01

    Two-detector coincidence measurements of the Doppler broadened annihilation spectra with a variable energy positron beam are carried out for the study of the annealing behavior of Si implanted with As, P, Cu and H ions. In P-implanted Si, growth of the defect complexes are observed in coincidence Doppler broadening spectra up to 400degC. In Cu-implanted Si, the formation of defect-Cu complexes is indicated. In H-implanted Si, the passivation effect of hydrogen on positron traps are observed in the low temperature region up to 400degC. (author)

  13. Characterization of diamond amorphized by ion implantation

    International Nuclear Information System (INIS)

    Allen, W.R.; Lee, E.H.

    1992-01-01

    Single crystal diamond has been implanted at 1 MeV with 2 x 10 20 Ar/m 2 . Rutherford backscattering spectrometry in a channeled geometry revealed a broad amorphized region underlying a thin, partially crystalline layer. Raman spectroscopy disclosed modifications in the bonding characteristic of the appearance of non-diamond carbon. The complementary nature of the two analysis techniques is demonstrated. The Knoop hardness of the implanted diamond was reduced by implantation

  14. Silicon carbide layer structure recovery after ion implantation

    International Nuclear Information System (INIS)

    Violin, Eh.E.; Demakov, K.D.; Kal'nin, A.A.; Nojbert, F.; Potapov, E.N.; Tairov, Yu.M.

    1984-01-01

    The process of recovery of polytype structure of SiC surface layers in the course of thermal annealing (TA) and laser annealing (LA) upon boron and aluminium implantation is studied. The 6H polytype silicon carbide C face (0001) has been exposed to ion radiation. The ion energies ranged from 80 to 100 keV, doses varied from 5x10 14 to 5x10 16 cm -2 . TA was performed in the 800-2000 K temperature range. It is shown that the recovery of the structure of silicon carbide layers after ion implantation takes place in several stages. Considerable effect on the structure of the annealed layers is exerted by the implantation dose and the type of implanted impurity. The recovery of polytype structure is possible only under the effect of laser pulses with duration not less than the time for the ordering of the polytype in question

  15. Fe doped Magnetic Nanodiamonds made by Ion Implantation

    Science.gov (United States)

    Chen, Chienhsu; Cho, I. C.; Jian, Hui-Shan; Niu, H.

    2017-02-01

    Here we present a simple physical method to prepare magnetic nanodiamonds (NDs) using high dose Fe ion-implantation. The Fe atoms are embedded into NDs through Fe ion-implantation and the crystal structure of NDs are recovered by thermal annealing. The results of TEM and Raman examinations indicated the crystal structure of the Fe implanted NDs is recovered completely. The SQUID-VSM measurement shows the Fe-NDs possess room temperature ferromagnetism. That means the Fe atoms are distributed inside the NDs without affecting NDs crystal structure, so the NDs can preserve the original physical and chemical properties of the NDs. In addition, the ion-implantation-introduced magnetic property might make the NDs to become suitable for variety of medical applications.

  16. Statistical 3D damage accumulation model for ion implant simulators

    International Nuclear Information System (INIS)

    Hernandez-Mangas, J.M.; Lazaro, J.; Enriquez, L.; Bailon, L.; Barbolla, J.; Jaraiz, M.

    2003-01-01

    A statistical 3D damage accumulation model, based on the modified Kinchin-Pease formula, for ion implant simulation has been included in our physically based ion implantation code. It has only one fitting parameter for electronic stopping and uses 3D electron density distributions for different types of targets including compound semiconductors. Also, a statistical noise reduction mechanism based on the dose division is used. The model has been adapted to be run under parallel execution in order to speed up the calculation in 3D structures. Sequential ion implantation has been modelled including previous damage profiles. It can also simulate the implantation of molecular and cluster projectiles. Comparisons of simulated doping profiles with experimental SIMS profiles are presented. Also comparisons between simulated amorphization and experimental RBS profiles are shown. An analysis of sequential versus parallel processing is provided

  17. Statistical 3D damage accumulation model for ion implant simulators

    CERN Document Server

    Hernandez-Mangas, J M; Enriquez, L E; Bailon, L; Barbolla, J; Jaraiz, M

    2003-01-01

    A statistical 3D damage accumulation model, based on the modified Kinchin-Pease formula, for ion implant simulation has been included in our physically based ion implantation code. It has only one fitting parameter for electronic stopping and uses 3D electron density distributions for different types of targets including compound semiconductors. Also, a statistical noise reduction mechanism based on the dose division is used. The model has been adapted to be run under parallel execution in order to speed up the calculation in 3D structures. Sequential ion implantation has been modelled including previous damage profiles. It can also simulate the implantation of molecular and cluster projectiles. Comparisons of simulated doping profiles with experimental SIMS profiles are presented. Also comparisons between simulated amorphization and experimental RBS profiles are shown. An analysis of sequential versus parallel processing is provided.

  18. Surface sputtering in high-dose Fe ion implanted Si

    International Nuclear Information System (INIS)

    Ishimaru, Manabu

    2007-01-01

    Microstructures and elemental distributions in high-dose Fe ion implanted Si were characterized by means of transmission electron microscopy and Rutherford backscattering spectroscopy. Single crystalline Si(0 0 1) substrates were implanted at 350 deg. C with 120 keV Fe ions to fluences ranging from 0.1 x 10 17 to 4.0 x 10 17 /cm 2 . Extensive damage induced by ion implantation was observed inside the substrate below 1.0 x 10 17 /cm 2 , while a continuous iron silicide layer was formed at 4.0 x 10 17 /cm 2 . It was found that the spatial distribution of Fe projectiles drastically changes at the fluence between 1.0 x 10 17 and 4.0 x 10 17 /cm 2 due to surface sputtering during implantation

  19. Surface disorder production during plasma immersion implantation and high energy ion implantation

    NARCIS (Netherlands)

    El-sherbiny, M.A.; Khanh, N.Q.; Wormeester, Herbert; Fried, M.; Fried, M.; Lohner, T.; Lohner, T.; Pinter, I.; Gyulai, J.

    1996-01-01

    High-depth-resolution Rutherford Backscattering Spectrometry (RBS) combined with channeling technique was used to analyze the surface layer formed during plasma immersion ion implantation (PIII) of single crystal silicon substrates. Single wavelength multiple angle of incidence ellipsometry (MAIE)

  20. Study of ion implantation in grown layers of multilayer coatings under ion-plasma vacuum deposition

    International Nuclear Information System (INIS)

    Voevodin, A.A.; Erokhin, A.L.

    1993-01-01

    The model of ion implantation into growing layers of a multilayer coating produced with vacuum ion-plasma deposition was developed. The model takes into account a possibility for ions to pass through the growing layer and alloys to find the distribution of implanted atoms over the coating thickness. The experimental vitrification of the model was carried out on deposition of Ti and TiN coatings

  1. Behavior of PET implanted by Ti, Ag, Si and C ion using MEVVA implantation

    International Nuclear Information System (INIS)

    Wu Yuguang; Zhang Tonghe; Zhang Yanwen; Zhang Huixing; Zhang Xiaoji; Zhou Gu

    2001-01-01

    Polyethylene terephthalane (PET) has been modified with Ti, Ag, Si and C ions from a metal vapor arc source (MEVVA). Ti, Ag, Si and C ions were implanted with acceleration voltage 40 kV to fluences ranging from 1x10 16 to 2x10 17 cm -2 . The surface of implanted PET darkened with increasing ion dose, when the metal ion dose was greater than 1x10 17 cm -2 the color changed to metallic bright. The surface resistance decreases by 5-6 orders of magnitude with increasing dose. The resistivity is stable after long-term storage. The depth of Ti- and Ag-implanted layer is approximately 150 and 80 nm measured by Rutherford backscattering (RBS), respectively. TEM photos revealed the presence of Ti and Ag nano-meter particles on the surface resulting from the high-dose implantation. Ti and Ag ion implantations improved conductivity and wear resistance significantly. The phase and structural changes were obtained by X-ray diffraction (XRD). It can be seen that nano-meter particles of Ti precipitation, TiO 2 and Ti-carbides have been formed in implanted layer. Nano-hardness of implanted PET has been measured by a nano-indenter. The results show that the surface hardness, modulus and wear resistance could be increased

  2. Ion implantation induced martensite nucleation in SUS301 steel

    International Nuclear Information System (INIS)

    Kinoshita, Hiroshi; Takahashi, Heishichiro; Gustiono, Dwi; Sakaguchi, Norihito; Shibayama, Tamaki; Watanabe, Seiichi

    2007-01-01

    Phase transformation behaviors of the austenitic 301 stainless steel was studied under Fe + , Ti + and Ar + ions implantation at room temperature with 100, 200 and 300 keV up to fluence of 1x10 21 ions/m 2 and the microstructures were observed by means of transmission electron microscopy (TEM). The plane and cross-sectional observations of the implanted specimen showed that the induced-phases due to implantation from the γ matrix phase were identified as α' martensite phases with the orientation relationship of (11-bar0) α parallel (111-bar) γ and [111] α parallel [011] γ close to the Kurdjumov-Sachs (K-S). The ion implantation induced phases nucleated near the surface region and the depth position of the nucleation changed depending on the ion accelerating energy and ion species. It was also found that the induced marten sites phases nucleate under the influence of the stress distribution, which is introduced due to the concentration of implanted ions, especially due to the stress gradient caused by the corresponding concentration gradient. (author)

  3. Implantation of D+ ions in niobium and deuterium gas reemission

    International Nuclear Information System (INIS)

    Pisarev, A.A.; Tel'kovskij, V.G.

    1975-01-01

    This is a study of the implanting and reflex gasoisolation of D ions in niobium. It has been discovered that deutrium scope and gasoisolation are defined by several processes. An assumption is made that in ion bombarding conditions the implanting solutions are possible to exist and that deutrium can be replaced on the basis of niobium and hydrid compounds NbxDy. The portion of the particles entrained in the metal in one or another way depends on the ion energy. The dependence of the scope coefficient of n D + ions from the target temperature in the range of 290-1500 K was registered. An increase of the scope coefficient of the ions at high temperature with an increase of the ion energy was discovered

  4. Electrical conductivity enhancement of polyethersulfone (PES) by ion implantation

    International Nuclear Information System (INIS)

    Bridwell, L.B.; Giedd, R.E.; Wang Yongqiang; Mohite, S.S.; Jahnke, T.; Brown, I.M.

    1991-01-01

    Amorphous polyethersulfone (PES) films have been implanted with a variety of ions (He, B, C, N and As) at a bombarding energy of 50 keV in the dose range 10 16 -10 17 ions/cm 2 . Surface resistance as a function of dose indicates a saturation effect with a significant difference between He and the other ions used. ESR line shapes in the He implanted samples changed from a mixed Gaussian/Lorentzian to a pure Lorentzian and narrowed with increasing dose. Temperature dependent resistivity indicates an electron hopping mechanism for conduction. Infrared results indicate cross-linking or self-cyclization occurred for all implanted ions with further destruction in the case of As. (orig.)

  5. Modification of electrical properties of polymer membranes by ion implantation

    International Nuclear Information System (INIS)

    Dworecki, K.; Hasegawa, T.; Sudlitz, K.; Wasik, S.

    2000-01-01

    This paper presents an experimental study of the electrical properties of polymer ion irradiated polyethylene terephthalate (PET) membranes. The polymer samples have been implanted with a variety of ions (O 5+ , N 4+ , Kr 9+ ) by the energy of 10 keV/q up to doses of 10 15 ions/cm 2 and then they were polarized in an electric field of 4.16x10 6 V/m at non-isothermal conditions. The electrical properties and the changes in the chemical structure of implanted membrane were measured by conductivity and discharge currents and FTIR spectra. Electrical conductivity of the membranes PET increases to 1-3 orders of magnitude after implantation and is determined by the charge transport caused by free space charge and by thermal detrapping of charge carriers. The spectra of thermally induced discharge current (TDC) shows that ion irradiated PET membranes are characterized by high ability to accumulate charge

  6. Hardening of cutting tool inserts by ion implantation

    International Nuclear Information System (INIS)

    Zlobin, V.N.; Bannikov, M.G.; Draper, P.H.; Zotov, A.V.

    2001-01-01

    Surface hardening has long been recognized as an important method of increasing the integrity and life of cutting tools. In this work we report preliminary investigations of hardening of conventional hard metal tools by ion implantation Three types of mixed carbide tool inserts were treated by bombardment with 40kV ions of Al, Ti, Zr or W in an ambient of Ar or N/sub 2/, with doses of up to 13*10/sup 17/ ions/cm/sup 2/. The samples were monitored by micro-hardness measurements. Complex behaviors as a function of the implantation dose/time have been observed, and are commented on in terms of the lattice disruption caused by the bombardment. Hardness increments of up to 22 % have been obtained using an ion implanter of industrial size, and cutting tests have shown an improvement, by a factor of three, in the life of these treated tools. (author)

  7. Surface modification of commercial tin coatings by carbon ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Liu, L.J.; Sood, D.K.; Manory, R.R. [Royal Melbourne Inst. of Tech., VIC (Australia)

    1993-12-31

    Commercial TiN coatings of about 2 {mu}m thickness on high speed steel substrates were implanted at room temperature with 95 keV carbon ions at nominal doses between 1 x 10{sup 17} - 8x10{sup 17} ions cm{sup -2}. Carbon ion implantation induced a significant improvement in ultramicrohardness, friction coefficient and wear properties. The surface microhardness increases monotonically by up to 115% until a critical dose is reached. Beyond this dose the hardness decreases, but remains higher than that of unimplanted sample. A lower friction coefficient and a longer transition period towards a steady state condition were obtained by carbon ion implantation. The changes in tribomechanical properties are discussed in terms of radiation damage and possible formation of a second phase rich in carbon. 6 refs., 3 figs.

  8. Reduced Graphene Oxide Films with Ultrahigh Conductivity as Li-Ion Battery Current Collectors.

    Science.gov (United States)

    Chen, Yanan; Fu, Kun; Zhu, Shuze; Luo, Wei; Wang, Yanbin; Li, Yiju; Hitz, Emily; Yao, Yonggang; Dai, Jiaqi; Wan, Jiayu; Danner, Valencia A; Li, Teng; Hu, Liangbing

    2016-06-08

    Solution processed, highly conductive films are extremely attractive for a range of electronic devices, especially for printed macroelectronics. For example, replacing heavy, metal-based current collectors with thin, light, flexible, and highly conductive films will further improve the energy density of such devices. Films with two-dimensional building blocks, such as graphene or reduced graphene oxide (RGO) nanosheets, are particularly promising due to their low percolation threshold with a high aspect ratio, excellent flexibility, and low cost. However, the electrical conductivity of these films is low, typically less than 1000 S/cm. In this work, we for the first time report a RGO film with an electrical conductivity of up to 3112 S/cm. We achieve high conductivity in RGO films through an electrical current-induced annealing process at high temperature of up to 2750 K in less than 1 min of anneal time. We studied in detail the unique Joule heating process at ultrahigh temperature. Through a combination of experimental and computational studies, we investigated the fundamental mechanism behind the formation of a highly conductive three-dimensional structure composed of well-connected RGO layers. The highly conductive RGO film with high direct current conductivity, low thickness (∼4 μm) and low sheet resistance (0.8 Ω/sq.) was used as a lightweight current collector in Li-ion batteries.

  9. Surface modification of austenitic stainless steel by titanium ion implantation

    International Nuclear Information System (INIS)

    Evans, P.J.; Hyvarinen, J.; Samandi, M.

    1995-01-01

    The wear properties of AISI 316 austenitic stainless steel implanted with Ti were investigated for ion doses in the range (2.3-5.4)x10 16 ionscm -2 and average ion energies of 60 and 90keV. The implanted layer was examined by Rutherford backscattering, from which the retained doses were determined, and glow discharge optical emission spectroscopy. Following implantation, the surface microhardness was observed to increase with the greatest change occurring at higher ion energy. Pin-on-disc wear tests and associated friction measurements were also performed under both dry and lubricated conditions using applied loads of 2N and 10N. In the absence of lubrication, breakthrough of the implanted layer occurred after a short sliding time; only for a dose of 5.1x10 16 ionscm -2 implanted at an average energy of 90keV was the onset of breakthrough appreciably delayed. In contrast, the results of tests with lubrication showed a more gradual variation, with the extent of wear decreasing with implant dose at both 2N and 10N loads. Finally, the influence of Ti implantation on possible wear mechanisms is discussed in the light of information provided by several surface characterization techniques. ((orig.))

  10. Terahertz generation from Cu ion implantation into lithium niobate

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Yuhua, E-mail: wyh61@163.com [Hubei Province Key Laboratory of Systems Science in Metallurgical Process, Wuhan university of Science and Technology, Wuhan 430081 (China); Wang, Ruwu; Yuan, Jie [Hubei Province Key Laboratory of Systems Science in Metallurgical Process, Wuhan university of Science and Technology, Wuhan 430081 (China); Wang, Yumei [Department of Nephrology, Union Hospital, Tongji Medical College, Huazhong University of Science and Technology, Wuhan 430022 (China)

    2014-03-15

    In this letter, the authors present first observation of terahertz generation from Cu implantation of lithium niobate crystal substrate. Lithium niobate single crystal is grown by Czochralski method. Metal nanoparticles synthesized by Cu ion implantation were implanted into lithium niobate single crystal using metal vapor vacuum arc (MEVVA) ion source. 1 kHz, 35 fs laser pulse centred at 800 nm was focused onto the samples. The supercontinuum spectra of the sample are obtained. Terahertz was generated via this kind of sample and investigated using the electro-optical sampling technique. The findings suggest that under the investigated implantation parameter, a strong spectral component in excess of 0.46 THz emission was found from Cu ion implantation of lithium niobate. -- Highlights: • We first observation of terahertz generation from Cu implantation of lithium niobate crystal substrate. • Lithium niobate single crystal is grown by Czochralski method. Cu nanoparticles in lithium niobate have been formed by using MEVVA ion source. • The THz bandwidth and center from this kind of sample were determined.

  11. Compression of self-ion implanted iron micropillars

    International Nuclear Information System (INIS)

    Grieveson, E.M.; Armstrong, D.E.J.; Xu, S.; Roberts, S.G.

    2012-01-01

    Highlights: ► Self-ion implantation used to cause cascade damage in pure iron. ► Increase in hardness measured in implanted region using nanoindentation. ► Micropillars manufactured and tested in both implanted and unimplanted material. ► Marked difference in deformation mechanisms in each set of pillars seen using scanning electron microscopy. ► No difference in yield stress seen, suggesting it is difficult to use micro-compression to understand bulk properties. - Abstract: Ion implantation causes displacement damage in materials, leading to the formation of small dislocation loops and can cause changes to the material’s mechanical properties. Samples of pure Fe were subjected to Fe + implantation at 275 °C, producing damage of ∼6 dpa to ∼1 μm depth. Nanoindentation into implanted material shows an increase in hardness compared to unimplanted material. Micropillars were manufactured in cross-section specimens of implanted and unimplanted material and compressed using a nanoindenter. The implanted pillars have a deformation mode which differs markedly from the unimplanted pillars but show no change in yield-stress. This suggests that the controlling mechanism for deformation is different between nanoindentation and micropillar compression and that care is needed if using micropillar compression to extract bulk properties of irradiated materials.

  12. Modification of ion implanted or irradiated single crystal sapphire

    International Nuclear Information System (INIS)

    Song Yin; Zhang Chonghong; Wang Zhiguang; Zhao Zhiming; Yao Cunfeng; Zhou Lihong; Jin Yunfan

    2006-01-01

    Single crystal sapphire (Al 2 O 3 ) samples were implanted at 600 K by He, Ne and Ar ions with energy of 110 keV to doses ranging from 5 x 10 16 to 2 x 10 17 ion/cm 2 or irradiated at 320 K by 208 Pb 27+ ion with energy of 1.1 MeV/u to the fluences ranging from 1 x 10 12 to 5 x 10 14 ion/cm 2 . The modification of structure and optical properties induced by ion implantation or irradiation were analyzed by using photoluminescence (PL) and Fourier transformation infrared spectrum (FTIR) spectra and transmission electron microscopy (TEM) measurements. The PL measurements showed that absorption peaks located at 375, 413 and 450 nm appeared in all the implanted or irradiated samples, the PL intensities reached up to the maximum for the 5 x 10 16 ion/cm 2 implanted samples. After Pb-ion irradiation, a new peak located at 390 nm formed. TEM analyses showed that small size voids (1-2 nm) with high density were formed in the region from the surface till to about 100 nm in depth and also large size Ne-bubble formed in the Ne-doped region. Form the obtained FTIR spectra, it was found that Pb-ion irradiation induced broadening of the absorption band in 460-510 cm -1 and position shift of the absorption band in 1000-1300 cm -1 towards to high wavenumber. The possible damage mechanism in single crystal sapphire induced by energetic ion implantation or irradiation was briefly discussed. (authors)

  13. Ion implantation and ion beam analysis of lithium niobate

    International Nuclear Information System (INIS)

    Arnold, G.W.

    1989-01-01

    This paper reports on implantations of He and Ti made into LiNbO 3 and the H and Li profiles determined by elastic recoil detection (ERD) techniques. The loss of Li and gain of H depends upon the supply of surface H (surface contaminants or ambient atmosphere). For 50 KeV He implants into LiNbO 3 through a 200 Angstrom Al film, the small Li loss is governed by the interface H. This is also the case for He implants into uncoated LiNbO 3 in a beam line with low hydrocarbon surface contamination; similar implants under conditions of greater hydrocarbon deposition result in proportionally larger Li loss and H gain in the implant damage region. The exchange is possible only for those He energies, i.e., 50 keV, where the damage profile intersects the surface. For Ti implants Li is lost with little H gain. For this case the Li loss is believed to result from radiation-enhanced diffusion. Where He implantation is used to establish waveguiding in LiNbO 3 , the presence or absence of H in the implanted region is crucial with regard to refractive index stability, due to the replacement of H by Li from the bulk

  14. N + surface doping on nanoscale polymer fabrics via ion implantation

    Science.gov (United States)

    Ho Wong, Kenneth Kar; Zinke-Allmang, Martin; Wan, Wankei

    2006-08-01

    Non-woven poly(vinyl alcohol) (PVA) fabrics composed of small diameter (∼110 nm) fibers have been spun by an electrospinning technique and then have been modified by ion implantation. 1.7 MeV N+ ion implantation with a dose of 1.2 × 1016 ions/cm2 was applied on the fabrics through a metal foil at room temperature. By using scanning electron microscopy (SEM), no surface morphology degradation has been observed on the fabric after the ion beam treatment. The diameter of the fibers has shrunk by 30% to about 74 nm. X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) show that nitrogen surface doping was achieved and the formation of two new functional chemical groups (N-Cdbnd O and C-N) in the PVA is observed.

  15. Magnetic patterning by means of ion irradiation and implantation

    International Nuclear Information System (INIS)

    Fassbender, J.; McCord, J.

    2008-01-01

    A pure magnetic patterning by means of ion irradiation which relies on a local modification of the magnetic anisotropy of a magnetic multilayer structure has been first demonstrated in 1998. Since then also other magnetic properties like the interlayer exchange coupling, the exchange bias effect, the magnetic damping behavior and the saturation magnetization to name a few have also been demonstrated to be affected by ion irradiation or ion implantation. Consequently, all these effects can be used if combined with a masking technique or employing direct focused ion beam writing for a magnetic patterning and thus an imprinting of an artificial magnetic domain structure, which subsequently modifies the integral magnetization reversal behavior or the magnetization dynamics of the film investigated. The present review will summarize how ion irradiation and implantation can affect the magnetic properties by means of structural modifications. The main part will cover the present status with respect to the pure magnetic patterning of micro- and nano structures

  16. Annealing behavior and selected applications of ion-implanted alloys

    International Nuclear Information System (INIS)

    Myers, S.M.

    Thermally activated processes cause ion-implanted metals to evolve from the initial state toward thermodynamic equilibrium. The degree of equilibration is strongly dependent upon temperature and is considered for three temperature regimes which are distinguished by the varying mobilities of interstitial and substitutional atoms. In addition, perturbations resulting from the irradiation environment are discussed. Examples are given of the use of implanted and annealed alloys in studies of diffusion, phase diagrams, and solute trapping

  17. Ion implantation for manufacturing bent and periodically bent crystals

    Energy Technology Data Exchange (ETDEWEB)

    Bellucci, Valerio; Camattari, Riccardo; Guidi, Vincenzo, E-mail: guidi@fe.infn.it; Mazzolari, Andrea; Paternò, Gianfranco [Department of Physics and Earth Sciences, University of Ferrara, Via Saragat 1/c, 44122 Ferrara, Italy and INFN, Section of Ferrara (Italy); Mattei, Giovanni, E-mail: giovanni.mattei@unipd.it; Scian, Carlo [Department of Physics and Astronomy Galileo Galilei, University of Padova, Via Marzolo 8, 35131 Padova (Italy); Lanzoni, Luca [Dipertimento di Economia e Tecnologia, Università degli Studi della Repubblica di San Marino, Salita alla Rocca, 44, 47890 San Marino Città (San Marino)

    2015-08-10

    Ion implantation is proposed to produce self-standing bent monocrystals. A Si sample 0.2 mm thick was bent to a radius of curvature of 10.5 m. The sample curvature was characterized by interferometric measurements; the crystalline quality of the bulk was tested by X-ray diffraction in transmission geometry through synchrotron light at ESRF (Grenoble, France). Dislocations induced by ion implantation affect only a very superficial layer of the sample, namely, the damaged region is confined in a layer 1 μm thick. Finally, an elective application of a deformed crystal through ion implantation is here proposed, i.e., the realization of a crystalline undulator to produce X-ray beams.

  18. Ion implantation of graphene-toward IC compatible technologies.

    Science.gov (United States)

    Bangert, U; Pierce, W; Kepaptsoglou, D M; Ramasse, Q; Zan, R; Gass, M H; Van den Berg, J A; Boothroyd, C B; Amani, J; Hofsäss, H

    2013-10-09

    Doping of graphene via low energy ion implantation could open possibilities for fabrication of nanometer-scale patterned graphene-based devices as well as for graphene functionalization compatible with large-scale integrated semiconductor technology. Using advanced electron microscopy/spectroscopy methods, we show for the first time directly that graphene can be doped with B and N via ion implantation and that the retention is in good agreement with predictions from calculation-based literature values. Atomic resolution high-angle dark field imaging (HAADF) combined with single-atom electron energy loss (EEL) spectroscopy reveals that for sufficiently low implantation energies ions are predominantly substitutionally incorporated into the graphene lattice with a very small fraction residing in defect-related sites.

  19. Osteoconductivity of hydrophilic microstructured titanium implants with phosphate ion chemistry.

    Science.gov (United States)

    Park, Jin-Woo; Jang, Je-Hee; Lee, Chong Soo; Hanawa, Takao

    2009-07-01

    This study investigated the surface characteristics and bone response of titanium implants produced by hydrothermal treatment using H(3)PO(4), and compared them with those of implants produced by commercial surface treatment methods - machining, acid etching, grit blasting, grit blasting/acid etching or spark anodization. The surface characteristics were evaluated by scanning electron microscopy, thin-film X-ray diffractometry, X-ray photoelectron spectroscopy, contact angle measurement and stylus profilometry. The osteoconductivity of experimental implants was evaluated by removal torque testing and histomorphometric analysis after 6 weeks of implantation in rabbit tibiae. Hydrothermal treatment with H(3)PO(4) and subsequent heat treatment produced a crystalline phosphate ion-incorporated oxide (titanium oxide phosphate hydrate, Ti(2)O(PO(4))(2)(H(2)O)(2); TiP) surface approximately 5microm in thickness, which had needle-like surface microstructures and superior wettability compared with the control surfaces. Significant increases in removal torque forces and bone-to-implant contact values were observed for TiP implants compared with those of the control implants (p<0.001). After thorough cleaning of the implants removed during the removal torque testing, a considerable quantity of attached bone was observed on the surfaces of the TiP implants.

  20. Yttrium ion implantation on the surface properties of magnesium

    International Nuclear Information System (INIS)

    Wang, X.M.; Zeng, X.Q.; Wu, G.S.; Yao, S.S.

    2006-01-01

    Owing to their excellent physical and mechanical properties, magnesium and its alloys are receiving more attention. However, their application has been limited to the high reactivity and the poor corrosion resistance. The aim of the study was to investigate the beneficial effects of ion-implanted yttrium using a MEVVA ion implanter on the surface properties of pure magnesium. Isothermal oxidation tests in pure O 2 at 673 and 773 K up to 90 min indicated that the oxidation resistance of magnesium had been significantly improved. Surface morphology of the oxide scale was analyzed using scanning electron microscope (SEM). Auger electron spectroscopy (AES) and X-ray diffraction (XRD) analyses indicated that the implanted layer was mainly composed of MgO and Y 2 O 3 , and the implanted layer with a duplex structure could decrease the inward diffusion of oxygen and reduce the outward diffusion of Mg 2+ , which led to improving the oxidation resistance of magnesium. Potentiodynamic polarization curves were used to evaluate the corrosion resistance of the implanted magnesium. The results show yttrium implantation could enhance the corrosion resistance of implanted magnesium compared with that of pure magnesium

  1. The recrystallization of ion-implanted silicon layers

    International Nuclear Information System (INIS)

    Christodoulides, C.E.; Baragiola, R.A.; Chivers, D.; Grant, W.A.; Williams, J.S.

    1978-01-01

    Rutherford backscattering and channeling (RBS) has been employed to investigate the annealing characteristics of ion-bombarded silicon for a wide range of implant species. The general recrystallization behaviour is that high levels of remnant disorder are observed for high-dose (typically > 10 15 ions cm -2 ) implants of all species investigated, and transmission electron microscopy indicates the presence of a polycrystalline reordered layer in such cases. The magnitude of the remnant disorder (misorientation of grains with respect to the underlying bulk substrate) is observed to increase with both implant dose and original amorphous-layer thickness and to exhibit a slight implant-mass dependence. Although the recrystallization behaviour is qualitatively similar for all species studied, certain species (mainly those soluble in silicon) are found to influence the regrowth process at low implant concentrations. It is suggested that stress/strain effects, attributed to high implanted concentrations, play a major role in the inhibition of epitaxial silicon recrystallization but that species effects can become dominant at lower implant concentrations. (author)

  2. Development of a CMOS process using high energy ion implantation

    International Nuclear Information System (INIS)

    Stolmeijer, A.

    1986-01-01

    The main interest of this thesis is the use of complementary metal oxide semiconductors (CMOS) in electronic technology. Problems in developing a CMOS process are mostly related to the isolation well of p-n junctions. It is shown that by using high energy ion implantation, it is possible to reduce lateral dimensions to obtain a rather high packing density. High energy ion implantation is also presented as a means of simplifying CMOS processing, since extended processing steps at elevated temperatures are superfluous. Process development is also simplified. (Auth.)

  3. Effect of ion implantation on thin hard coatings

    International Nuclear Information System (INIS)

    Auner, G.; Hsieh, Y.F.; Padmanabhan, K.R.; Chevallier, J.; Soerensen, G.

    1983-01-01

    The surface mechanical properties of thin hard coatings of carbides, nitrides and borides deposited by r.f. sputtering were improved after deposition by ion implantation. The thickness and the stoichiometry of the films were measured by Rutherford backscattering spectrometry and nuclear reaction analysis before and after ion bombardment. The post ion bombardment was achieved with heavy inert ions such as Kr + and Xe + with an energy sufficient to penetrate the film and to reach the substrate. Both the film adhesion and the microhardness were consistently improved. In order to achieve a more detailed understanding, Rb + and Ni + ions were also used as projectiles, and it was found that these ions were more effective than the inert gas ions. (Auth.)

  4. Structure transformations in ion implanted anodic alumina films

    International Nuclear Information System (INIS)

    Cherenda, N.N.; Uglov, V.V.; Litvinovich, G.V.; Daniluyk, A.L.

    2002-01-01

    The effect of ion implantation on aluminium oxide has been widely studied. The change of mechanical, electrical, optical and chemical properties were investigated. Most studies were performed on a single crystal (a- or c-oriented) α-Al 2 O 3 though polycrystalline α-Al 2 O 3 or amorphous aluminium oxide films were the subject of the investigation too. Porous anodic alumina films were the object of the investigation of this work. An unique structure, low cost, controllability and ease of production allow it application in developing of microelectronic devices. Earlier it was shown that implantation of metal ions in anodic alumina films decreases its surface resistance to tens of Ωm. The aim of this work was the investigation of anodic alumina films structure changes after implantation. The implantation of Ti and Cu ions was carried out using a MEVVA source with an impulse duration of 1 ms. The applied acceleration voltage was 80 kV, the ions current density - 53 μA/cm 2 , the doses -1·10 17 ions/cm 2 and 1.5·10 18 ions/cm 2 . Implantation was carried out into two types of crystalline structure: amorphous and γ-Al 2 O 3 . The latter structure was produced by annealing at 830 deg. C. A variety of techniques were used for phase and element composition investigations: X-ray diffraction analysis, Auger electron spectroscopy, Rutherford backscattering analysis and scanning electron microscopy. It was found that implantation into amorphous film results in the formation of γ-AO 2 O 3 while implantation into γ-Al 2 O 3 film - in the formation of an amorphous structure. Implantation both to amorphous and crystalline AA films also led to the formation of θ-Al 2 O 3 phase inclusions in the film structure. The whole structure of AA films with the thickness of 200 μm undergoes these transformations. Implantation also lead to sputtering of the surface barrier layer thus resulting in the shift of the ions depth profile to the surface at higher doses. Diffusion of Ti

  5. Corrosion resistance of titanium ion implanted AZ91 magnesium alloy

    International Nuclear Information System (INIS)

    Liu Chenglong; Xin Yunchang; Tian Xiubo; Zhao, J.; Chu, Paul K.

    2007-01-01

    Degradable metal alloys constitute a new class of materials for load-bearing biomedical implants. Owing to their good mechanical properties and biocompatibility, magnesium alloys are promising in degradable prosthetic implants. The objective of this study is to improve the corrosion behavior of surgical AZ91 magnesium alloy by titanium ion implantation. The surface characteristics of the ion implanted layer in the magnesium alloys are examined. The authors' results disclose that an intermixed layer is produced and the surface oxidized films are mainly composed of titanium oxide with a lesser amount of magnesium oxide. X-ray photoelectron spectroscopy reveals that the oxide has three layers. The outer layer which is 10 nm thick is mainly composed of MgO and TiO 2 with some Mg(OH) 2 . The middle layer that is 50 nm thick comprises predominantly TiO 2 and MgO with minor contributions from MgAl 2 O 4 and TiO. The third layer from the surface is rich in metallic Mg, Ti, Al, and Ti 3 Al. The effects of Ti ion implantation on the corrosion resistance and electrochemical behavior of the magnesium alloys are investigated in simulated body fluids at 37±1 deg. C using electrochemical impedance spectroscopy and open circuit potential techniques. Compared to the unimplanted AZ91 alloy, titanium ion implantation significantly shifts the open circuit potential (OCP) to a more positive potential and improves the corrosion resistance at OCP. This phenomenon can be ascribed to the more compact surface oxide film, enhanced reoxidation on the implanted surface, as well as the increased β-Mg 12 Al 17 phase

  6. Application of TXRF for ion implanter dose matching experiments

    Science.gov (United States)

    Frost, M. R.; French, M.; Harris, W.

    2004-06-01

    Secondary ion mass spectrometry (SIMS) has been utilized for many years to measure the dose of ion implants in silicon for the purpose of verifying the ability of ion implantation equipment to accurately and reproducibly implant the desired species at the target dose. The development of statistically and instrumentally rigorous protocols has lead to high confidence levels, particularly with regard to accuracy and short-term repeatability. For example, high-dose, high-energy B implant dosimetry can be targeted to within ±1%. However, performing dose determination experiments using SIMS does have undesirable aspects, such as being highly labor intensive and sample destructive. Modern total reflection X-ray fluorescence (TXRF) instruments are equipped with capabilities for full 300 mm wafer handling, automated data acquisition software and intense X-ray sources. These attributes enable the technique to overcome the SIMS disadvantages listed above, as well as provide unique strengths that make it potentially highly amenable to implanter dose matching. In this paper, we report on data collected to date that provides confidence that TXRF is an effective and economical method to perform these measurements within certain limitations. We have investigated a number of ion implanted species that are within the "envelope" of TXRF application. This envelope is defined by a few important parameters. Species: For the anode materials used in the more common X-ray sources on the market, each has its own set of elements that can be detected. We have investigated W and Mo X-ray sources, which are the most common in use in commercial instrumentation. Implant energy: In general, if the energy of the implanted species is too high (or more specifically, the distribution of the implanted species is too deep), the amount of dopant not detected by TXRF may be significant, increasing the error of the measurement. Therefore, for each species investigated, the implant energy cannot exceed a

  7. Amorphous GaP produced by ion implantation

    International Nuclear Information System (INIS)

    Shimada, T.; Kato, Y.; Shiraki, Y.; Komatsubara, K.F.

    1976-01-01

    Two types of non-crystalline states ('disordered' and 'amorphous') of GaP were produced by using ion implantation and post annealing. A structural-phase-transition-like annealing behaviour from the 'disordered' state to the 'amorphous' state was observed. The ion dose dependence and the annealing behaviour of the atomic structure of GaP implanted with 200 keV -N + ions were studied by using electron diffraction, backscattering and volume change measurements. The electronic structure was also investigated by measuring optical absorption and electrical conductivity. The implanted layer gradually loses the crystalline order with the increase of the nitrogen dose. The optical absorption coefficient α and electric conductivity sigma of GaP crystals implanted with 200 keV -N + ions of 1 x 10 16 cm -2 were expressed as αhν = C(hν - E 0 )sup(n) and log sigma = A -BTsup(-1/4), respectively. Moreover, the volume of the implanted layer increased about three percent and the electron diffraction pattern was diffused halo whose intensity monotonically decreases along the radial direction. These results indicate that the as-implanted layer has neither a long range order or short range order ('disordered state'). In the sample implanted at 1 x 10 16 cm -2 , a structural phase-transition-like annealing stage was observed at around 400 0 C. That is, the optical absorption coefficient abruptly fell off from 6 x 10 4 to 7 x 10 3 cm -1 and the volume of the implanted layer decreased about 2% within an increase of less than 10 degrees in the anneal temperature. Moreover, the short range order of the lattice structure appeared in the electron diffraction pattern. According to the backscattering experiment, the heavily implanted GaP was still in the non-crystalline state even after annealing. These facts suggest that heavily implanted GaP, followed by annealing at around 400 0 C, is in the 'amorphous' state, although as-implanted GaP is not in the 'amorphous' state but in the

  8. Characterization of duplex hard coatings with additional ion implantation

    Directory of Open Access Journals (Sweden)

    B. Škorić

    2012-01-01

    Full Text Available In this paper, we present the results of a study of TiN thin fi lms which are deposited by a Physical Vapour Deposition (PVD and Ion Beam Assisted Deposition (IBAD. In the present investigation the subsequent ion implantation was provided with N+2 ions. The ion implantation was applied to enhance the mechanical properties of surface. The thin film deposition process exerts a number of eff ects such as crystallographic orientation, morphology, topography, densifi cation of the fi lms. The evolution of the microstructure from porous and columnar grains to densel packed grains is accompanied by changes in mechanical and physical properties. A variety of analytic techniques were used for characterization, such as scratch test, calo test, Scanning electron microscopy (SEM, Atomic Force Microscope (AFM, X-ray diff raction (XRD and Energy Dispersive X-ray analysis (EDAX.

  9. Semiconductor applications of plasma immersion ion implantation ...

    Indian Academy of Sciences (India)

    Unknown

    implantation technology. MUKESH KUMAR*, RAJKUMAR†, DINESH KUMAR and P J GEORGE. Department of Electronic Science, Kurukshetra University, Kurukshetra 136 119, India. †Semiconductor Complex Ltd., Industrial Area Phase 8, Mohali 160 059, India. Abstract. Many semiconductor integrated circuit ...

  10. Large area buried nanopatterning by broad ion implantation without any mask or direct writing

    OpenAIRE

    Karmakar, Prasanta; Satpati, Biswarup

    2013-01-01

    We have introduced here a simple, single step and cost effective broad ion beam technique for preparation of nanoscale electronic, magnetic, optical and mechanical devices without the need of resist, mask, or focused electron and ion beams. In this approach, broad beam ion implantation of desired atom on a prefabricated ion beam patterned surface promotes site selective deposition by adjusting the local angle of ion implantation. We show that implantation of Fe ions on an O+ induced pre fabri...

  11. Chemical effects induced by ion implantation in molecular solids

    Energy Technology Data Exchange (ETDEWEB)

    Foti, G.; Calcagno, L. (Catania Univ. (Italy). Ist. di Struttura della Materia); Puglisi, O. (Catania Univ. (Italy). Ist. Dipartimentale di Chimica e di Chimica Industriale)

    1983-05-01

    Ion implantation in molecular solids as ice, frozen noble gases, benzene and polymers produces a large amount of new molecules compared to the starting materials. Mass and energy analysis of ejected molecules together with the erosion yield, are discussed for several ion-target combinations at low temperature. The observed phenomena are analyzed in terms of deposited energy in electronic and nuclear collisions, for incoming beams, as helium or argon, in the range 10-2000 keV.

  12. Very broad beam metal ion source for large area ion implantation application

    International Nuclear Information System (INIS)

    Brown, I.; Anders, S.; Dickinson, M.R.; MacGill, R.A.; Yao, X.

    1993-01-01

    The authors have made and operated a very broad beam version of vacuum arc ion source and used it to carry out high energy metal ion implantation of a particularly large substrate. A multiple-cathode vacuum arc plasma source was coupled to a 50 cm diameter beam extractor (multiple aperture, accel-decel configuration) operated at a net extraction voltage of up to 50 kV. The metal ion species chosen were Ni and Ta. The mean ion charge state for Ni and Ta vacuum arc plasmas is 1.8 and 2.9, respectively, and so the mean ion energies were up to about 90 and 145 keV, respectively. The ion source was operated in a repetitively pulsed mode with pulse length 250 μs and repetition rate several pulses per second. The extracted beam had a gaussian profile with FWHM about 35 cm, giving a nominal beam area of about 1,000 cm 2 . The current of Ni or Ta metal ions in the beam was up to several amperes. The targets for the ion implantation were a number of 24-inch long, highly polished Cu rails from an electromagnetic rail gun. The rails were located about 80 cm away from the ion source extractor grids, and were moved across a diameter of the vessel in such a way as to maximize the uniformity of the implant along the rail. The saturation retained dose for Ta was limited to about 4 x 10 16 cm -2 because of the rather severe sputtering, in accordance with the theoretical expectations for these implantation conditions. Here they describe the ion source, the implantation procedure, and the kinds of implants that can be produced in this way

  13. Materials science issues of plasma source ion implantation

    International Nuclear Information System (INIS)

    Nastasi, M.; Faehl, R.J.; Elmoursi, A.A.

    1996-01-01

    Ion beam processing, including ion implantation and ion beam assisted deposition (IBAD), are established surface modification techniques which have been used successfully to synthesize materials for a wide variety of tribological applications. In spite of the flexibility and promise of the technique, ion beam processing has been considered too expensive for mass production applications. However, an emerging technology, Plasma Source Ion Implantation (PSII), has the potential of overcoming these limitations to become an economically viable tool for mass industrial applications. In PSII, targets are placed directly in a plasma and then pulsed-biased to produce a non-line-of-sight process for intricate target geometries without complicated fixturing. If the bias is a relatively high negative potential (20--100 kV) ion implantation will result. At lower voltages (50--1,200 V), deposition occurs. Potential applications for PSII are in low-value-added products such as tools used in manufacturing, orthopedic devices, and the production of wear coatings for hard disk media. This paper will focus on the technology and materials science associated with PSII

  14. Single track regime in ion implanted polystyrene

    Energy Technology Data Exchange (ETDEWEB)

    Licciardello, A.; Puglisi, O.; Calcagno, L.; Foti, G.

    1988-05-01

    The molecular weight distribution (MWD) of nearly monodisperse polystyrene thin films is heavily affected by ion bombardment. The main effect is an increase of the MW and is detectable at fluences as low as 10/sup 11/ ions cm/sup -2/ for 400 keV Ar/sup +/ bombardment. A statistical model, here outlined for the first time, allows us the predict the size distribution of these high MW components. From the analysis of the MWD curves one can extract useful information concerning the lateral dimensions of the ion tracks.

  15. Adhesive and abrasive wear mechanisms in ion implanted metals

    International Nuclear Information System (INIS)

    Dearnaley, G.

    1985-01-01

    The distinction between adhesive and abrasive wear processes was introduced originally by Burwell during the nineteen-fifties, though some authors prefer to classify wear according to whether it is mild or severe. It is argued here that, on the basis of the performance of a variety of ion implanted metal surfaces, exposed to different modes of wear, the Burwell distinction is a valid one which, moreover, enables us to predict under which circumstances a given treatment will perform well. It is shown that, because wear rates under abrasive conditions are very sensitive to the ratio of the hardness of the surface to that of the abrasive particles, large increases in working life are attainable as a result of ion implantation. Under adhesive wear conditions, the wear rate appears to fall inversely as the hardness increases, and it is advantageous to implant species which will create and retain a hard surface oxide or other continuous film in order to reduce metal-metal contact. By the appropriate combination of physico-chemical changes in an implanted layer it has been possible to reduce wear rates by up to three orders of magnitude. Such rates compensate for the shallow depths achievable by ion implantation. (orig.)

  16. Chemical characterization of 4140 steel implanted by nitrogen ions

    International Nuclear Information System (INIS)

    Nino, Ely Dannier V.; Duran, Fernando; Pinto, Jose L.C.; Dugar-Zhabon, V.; Garnica, Hernan

    2010-01-01

    AISI-SAE 4140 sample surfaces of different roughness which are implanted by nitrogen ions of 20 keV and 30 keV at a dose of 10 17 ions/cm 2 through a three dimensional ion implantation technique are studied. Crystal phases of nitrogen compositions of the implanted samples, obtained with help of an x-ray diffraction method, are confronted with the data reported by the International Centre for Diffraction Data (ICDD), PDF-2. It is observed that the implanted into the metal nitrogen atoms produce changes in orientation of crystal planes that is manifested as variations of the intensity of the refracted rays and of cell dimensions (a displacement of 2 theta of the maximum intensity position). An analysis for determining nitrogen atoms implanted by high-voltage pulsed discharges at low pressures in the crystal structure of the solid surface was carried out by X-Ray Diffraction due to this technique permits to assess the possibility of formation of new compounds. (author)

  17. Damage and in-situ annealing during ion implantation

    International Nuclear Information System (INIS)

    Sadana, D.K.; Washburn, J.; Byrne, P.F.; Cheung, N.W.

    1982-11-01

    Formation of amorphous (α) layers in Si during ion implantation in the energy range 100 keV-11 MeV and temperature range liquid nitrogen (LN)-100 0 C has been investigated. Cross-sectional transmission electron microscopy (XTEM) shows that buried amorphous layers can be created for both room temperature (RT) and LN temperature implants, with a wider 100 percent amorphous region for the LN cooled case. The relative narrowing of the α layer during RT implantation is attributed to in-situ annealing. Implantation to the same fluence at temperatures above 100 0 C does not produce α layers. To further investigate in situ annealing effects, specimens already containing buried α layers were further irradiated with ion beams in the temperature range RT-400 0 C. It was found that isolated small α zones (less than or equal to 50 diameter) embedded in the crystalline matrix near the two α/c interfaces dissolved into the crystal but the thickness of the 100 percent α layer was not appreciably affected by further implantation at 200 0 C. A model for in situ annealing during implantation is presented

  18. Biological effect of nitrogen ion implantation on stevia

    International Nuclear Information System (INIS)

    Wang Cailian; Shen Mei; Chen Qiufang; Shu Shizhen

    1997-10-01

    Dry seed of stevia were implanted by 35∼150 keV nitrogen ions with various doses. The biological effect in M 1 was studied. The results showed that nitrogen ion beam was able to induce variation on chromosome structure in root tip cells. The rate of cells with chromosome aberration was increased with ion beam energy and dose added, but there was on significant linear regression relationship between ion dose and aberration rate. The results indicated the seedling height reduced with the increasing of dose for ion beam. The biological effect of nitrogen ion beam on M 1 stevia was lower than that of γ-rays. (6 refs., 1 fig., 4 tabs.)

  19. Quantum Hall samples prepared by helium-ion implantation

    International Nuclear Information System (INIS)

    Bruus, H.; Lindelof, P.E.; Veje, E.

    1990-01-01

    We have produced GaAs/GaAlAs heterostructure based quantum Hall samples with a wide range of electron mobilities using ion implantation. The purpose has been to optimize the samples for use in metrology. We have in particular studied the critical current and the non-ohmic behavior of our samples in the vicinity of a quantum Hall plateau. (orig.)

  20. Lattice sites of ion-implanted Li in diamond

    NARCIS (Netherlands)

    Restle, M.; Bharuth-Ram, K.; Quintel, H.; Ronning, C. R.; Hofsäss, H. C.; Jahn, S. G.; Wahl, U.

    1995-01-01

    Published in: Appl. Phys. Lett. 66 (1995) 2733-2735 citations recorded in [Science Citation Index] Abstract: Radioactive Li ions were implanted into natural IIa diamonds at temperatures between 100 K and 900 K. Emission channelling patterns of a-particles emitted in the nuclear decay of 8Li (t1/2 =

  1. Extreme Precipitation Strengthening in Ion-Implanted Nickel

    International Nuclear Information System (INIS)

    Follstaedt, D.M.; Knapp, J.A.; Myers, S.M.; Petersen, G.A.

    1999-01-01

    Precipitation strengthening of nickel was investigated using ion-implantation alloying and nanoindentation testing for particle separations in the nanometer range and volume fractions extending above 10O/O. Ion implantation of either oxygen alone or oxygen plus aluminum at room temperature was shown to produce substantial strengthening in the ion-treated layer, with yield strengths near 5 GPa in both cases. After annealing to 550''C the oxygen-alone layer loses much of the benefit, with its yield strength reduced to 1.2 GP but the dual ion-implanted layer retains a substantially enhanced yield strength of over 4 GPa. Examination by transmission electron f microscopy showed very fine dispersions of 1-5 nm diameter NiO and y-A1203 precipitates in the implanted layers before annealing. The heat treatment at 550''C induced ripening of the NiO particles to sizes ranging from 7 to 20 nm, whereas the more stable -A1203 precipitates were little changed. The extreme strengthening we observe is in semiquantitative agreement with predictions based on the application of dispersion-hardening theory to these microstructure

  2. Raman microprobe measurements of stress in ion implanted materials

    International Nuclear Information System (INIS)

    Nugent, K.W.; Prawer, S.; Weiser, P.S.; Dooley, S.P.

    1993-01-01

    Raman microprobe measurements of ion implanted diamond and silicon have shown significant shifts in the Raman line due to stresses in the materials. The Raman line shifts to higher energy if the stress is compressive and to lower energy for tensile stress 1 . The silicon sample was implanted in a 60 μm square with 2.56 x 10 17 ions per square centimeter of 2 MeV Helium. This led to the formation of raised squares with the top 370mm above the original surface. In Raman studies of silicon using visible light, the depth of penetration of the laser beam into the sample is much less than one micron. It was found that the Raman line is due to the silicon overlying the damage region. The diamond sample was implanted with 2 x 10 15 ions per square centimeter of 2.8 MeV carbon. It was concluded that the Raman spectrum could provide information concerning both the magnitude and the direction of stress in an ion implanted sample. It was possible in some cases to determine whether the stress direction is parallel or perpendicular to the sample surface. 1 refs., 2 figs

  3. Surface ion implantation induced by laser-generated plasmas

    Czech Academy of Sciences Publication Activity Database

    Giuffrida, L.; Torrisi, L.; Gammino, S.; Wolowski, J.; Ullschmied, Jiří

    2010-01-01

    Roč. 165, 6-10 (2010), s. 534-542 ISSN 1042-0150. [International Workshop on Pulsed Plasma Laser Ablation (PPLA)/4./. Monte Pieta, Messina, 18.06.2009-20.06.2009] Institutional support: RVO:61389021 Keywords : laser ablation * laser plasma * ion implantation * RBS analysis Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.660, year: 2010

  4. Plasma effects for heavy ions in implanted silicon detectors

    International Nuclear Information System (INIS)

    Aiello, S.; Anzalone, A.; Campisi, M.G.; Cardella, G.; Cavallaro, Sl.; Filippo, E. De; Geraci, E.; Geraci, M.; Guazzoni, P.; Manno, M.C. Iacono; Lanzalone, G.; Lanzano, G.; Nigro, S. Lo; Pagano, A.; Papa, M.; Pirrone, S.; Politi, G.; Porto, F.; Rizzo, F.; Sambataro, S.; Sperduto, M.L.; Sutera, C.; Zetta, L.

    1999-01-01

    Plasma effects for heavy ions in implanted silicon detectors have been investigated for different detector characteristics as a function of type and energy of the detected particles. A new approach is presented and used to reproduce the effect of the plasma delay in the timing performances. The results are in good agreement with the present data and with previous measurements found in the literature

  5. Raman microprobe measurements of stress in ion implanted materials

    Energy Technology Data Exchange (ETDEWEB)

    Nugent, K.W.; Prawer, S.; Weiser, P.S.; Dooley, S.P. [Melbourne Univ., Parkville, VIC (Australia). School of Physics

    1993-12-31

    Raman microprobe measurements of ion implanted diamond and silicon have shown significant shifts in the Raman line due to stresses in the materials. The Raman line shifts to higher energy if the stress is compressive and to lower energy for tensile stress{sup 1}. The silicon sample was implanted in a 60 {mu}m square with 2.56 x 10{sup 17} ions per square centimeter of 2 MeV Helium. This led to the formation of raised squares with the top 370mm above the original surface. In Raman studies of silicon using visible light, the depth of penetration of the laser beam into the sample is much less than one micron. It was found that the Raman line is due to the silicon overlying the damage region. The diamond sample was implanted with 2 x 10{sup 15} ions per square centimeter of 2.8 MeV carbon. It was concluded that the Raman spectrum could provide information concerning both the magnitude and the direction of stress in an ion implanted sample. It was possible in some cases to determine whether the stress direction is parallel or perpendicular to the sample surface. 1 refs., 2 figs.

  6. Study about iron disilicide formation by high current ion implantation

    CERN Document Server

    Liu, Z Q; Li, W Z

    2002-01-01

    beta-FeSi sub 2 exhibits a strong optical absorption and luminescence peak at the energy of about 0.85 eV, which corresponds to the wavelength window preferred for optical communication systems. This property makes beta-FeSi sub 2 a promising material to be used in optoelectronic applications and it has received great research interest. In this study, the formation of beta-FeSi sub 2 by high current ion implantation using a metal vapor vacuum arc ion source was investigated. Fe atoms with dose ranging from 4x10 sup 1 sup 7 to 2x10 sup 1 sup 8 /cm sup 2 were implanted into (1 0 0)Si substrates. Pure beta-FeSi sub 2 was successfully fabricated. alpha-FeSi sub 2 with strong (1 1 1) preferred orientation was also formed when the implantation was conducted at the temperature of 580 degree sign C.

  7. Infrared spectroscopy analysis of physico-chemical modifications induced by heavy ions in ultra-high molecular weight polyethylene

    International Nuclear Information System (INIS)

    Chappa, V.C.; Grosso, M.F. del; Garcia-Bermudez, G.; Mazzei, R.O.

    2006-01-01

    Structural analysis with infrared spectroscopy was carried out on ultra-high molecular weight polyethylene (UHMWPE). The polyethylene was irradiated using Li, C, N, S and I heavy ion beams with different fluences. The analysis showed that the absorbance of the C=C stretching vibration from trans-vinylene groups containing hydroperoxides presents a maximum at certain ion fluence and is correlated with the ion stopping power. The results were analyzed by a Monte Carlo simulation program that models the irradiation process from a geometrical point of view, in which the latent tracks consist in a central core zone surrounded by a larger perturbed region. This study suggests that it is possible to estimate the core dimension from absorbance measurements as a function of fluence. A possible relationship between this C=C structure with the cross-link of two polymeric chains is discussed

  8. Upgraded vacuum arc ion source for metal ion implantation

    International Nuclear Information System (INIS)

    Nikolaev, A. G.; Oks, E. M.; Savkin, K. P.; Yushkov, G. Yu.; Brown, I. G.

    2012-01-01

    Vacuum arc ion sources have been made and used by a large number of research groups around the world over the past twenty years. The first generation of vacuum arc ion sources (dubbed ''Mevva,'' for metal vapor vacuum arc) was developed at Lawrence Berkeley National Laboratory in the 1980s. This paper considers the design, performance parameters, and some applications of a new modified version of this kind of source which we have called Mevva-V.Ru. The source produces broad beams of metal ions at an extraction voltage of up to 60 kV and a time-averaged ion beam current in the milliampere range. Here, we describe the Mevva-V.Ru vacuum arc ion source that we have developed at Tomsk and summarize its beam characteristics along with some of the applications to which we have put it. We also describe the source performance using compound cathodes.

  9. Ion implantation planar in targets with semi-cylindrical grooves

    International Nuclear Information System (INIS)

    Filiz, Y.; Demokan, O.

    2002-01-01

    The experimental and numerical investigations suggest that the ion-matrix phase of the sheath evolution plays a crucial role in determining the ion flux to the target surfaces . It can easily be realized that conformal mapping of the target's surface by the sheath is questionable, or even inapplicable in the case of surfaces with fine irregularities or this continuities. The theoretical analysis of such cases is evidently quite complicated. On the other hand, most actual targets fall into this category, and hence, the understanding of the corresponding sheath behavior remains vital for accomplishing uniform implantation. The ion- matrix sheaths have been treated analytically by Conrad for planar, cylindrical and spherical targets successfully. Similar y, Sheridan and Zang et al. have investigated the ion matrix sheath in cylindrical bores, without and with axial electrodes, respectively. All these works assumed targets with infinite areas or length, Zeng et al. and Kwok et al. have started studying implantation into grooves, by carrying out simulations for the inner and outer races of bearings, which are modeled as semi- cylinders of infinite length. Finally, Demokan has presented the first analytic treatment of on matrix sheaths in two- dimensions, by considering targets with rectangular grooves of infinite length, representing a broad range of industrial items. In this work, ion-matrix sheath near infinite length are theoretically analysed. Understanding the sheath formation near such targets is essential for achieving successful ion implantation on the surfaces of a broad range of industrial products, including all types of bearings. The potential profiles both inside and outside the groove are derived and the consequent ion velocity higher plasma densities may improve the uniformity of implantation on the surfaces of such grooves. Furthermore, the sheath edge deformation due to the grooves, the variation of the angle of incidence on the surface of the groove

  10. Substitutionality of Ge atoms in ion implanted AlSb

    International Nuclear Information System (INIS)

    Yu, K.M.; Moll, A.J.; Chan, N.; Walukiewicz, W.; Becla, P.

    1995-01-01

    The substitution of Ge atoms into ion implanted AlSb is investigated by extended x-ray absorption fine structure spectroscopy. Our results reveal that in the as-implanted material, the implanted Ge atoms are equally distributed between two specific sites, one surrounded by Al atoms and the other surrounded by Sb atoms. After annealing at 750 degree C for 5 s, the coordination number of the Ge atoms increases from ∼3 to ∼4 indicating solid phase regrowth of the implantation induced amorphous surface layer. Moreover, in the annealed AlSb, the substitution of Ge atoms into the Al sublattice dominates with an estimated Ge Al :[Ge Sb ]∼0.8:0.2. These results suggest that Ge atoms act preferentially as donor species in AlSb

  11. Negative-ion current density dependence of the surface potential of insulated electrode during negative-ion implantation

    International Nuclear Information System (INIS)

    Tsuji, Hiroshi; Okayama, Yoshio; Toyota, Yoshitaka; Gotoh, Yasuhito; Ishikawa, Junzo; Sakai, Shigeki; Tanjyo, Masayasu; Matsuda, Kouji.

    1994-01-01

    Positive ion implantation has been utilized as the method of impurity injection in ultra-LSI production, but the problem of substrate charging cannot be resolved by conventional charge compensation method. It was forecast that by negative ion implantation, this charging problem can be resolved. Recently the experiment on the negative ion implantation into insulated electrodes was carried out, and the effect of negative ion implantation to this problem was proved. However, the dependence of charged potential on the increase of negative ion current at the time of negative ion implantation is a serious problem in large current negative ion implantation hereafter. The charged potential of insulated conductor substrates was measured by the negative ion implantation using the current up to several mA/cm 2 . The experimental method is explained. Medium current density and high current density negative ion implantation and charged potential are reported. Accordingly in negative ion implantation, if current density is optimized, the negative ion implantation without charging can be realized. (K.I.)

  12. Charging of dielectric substrate materials during plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Tian Xiubo; Fu, Ricky K.Y.; Chen Junying; Chu, Paul K.; Brown, Ian G.

    2002-01-01

    We have investigated the electrostatic charging effects of dielectric substrate materials during plasma immersion ion implantation. The results demonstrate that the time-dependent surface potential (negative) may be reduced in magnitude due to the charging effect of the dielectric surface, leading in turn to a reduction in the energy of the incident ions and a broadening of the implanted ion energy spectrum. The charging effect is greater during the plasma immersion bias pulse rise-time, and the electrostatic potential charging may be as large as 75% of the total applied (pulse) potential. This is due to abundant charge movement both of ions and secondary electrons, and has been confirmed by computer simulation. The plasma sheath capacitance has a small influence on the surface potential, via the bias pulse rise-time. Processing parameters, for example voltage, pulse duration, plasma density, and pulse rise-time, have a critical influence on the charging effects. Short pulse duration, high pulse frequency and low plasma density are beneficial from the viewpoint of maximizing the implantation ion energy

  13. Broad-beam, high current, metal ion implantation facility

    International Nuclear Information System (INIS)

    Brown, I.G.; Dickinson, M.R.; Galvin, J.E.; Godechot, X.; MacGill, R.A.

    1990-07-01

    We have developed a high current metal ion implantation facility with which high current beams of virtually all the solid metals of the Periodic Table can be produced. The facility makes use of a metal vapor vacuum arc ion source which is operated in a pulsed mode, with pulse width 0.25 ms and repetition rate up to 100 pps. Beam extraction voltage is up to 100 kV, corresponding to an ion energy of up to several hundred keV because of the ion charge state multiplicity; beam current is up to several Amperes peak and around 10 mA time averaged delivered onto target. Implantation is done in a broad-beam mode, with a direct line-of-sight from ion source to target. Here we describe the facility and some of the implants that have been carried out using it, including the 'seeding' of silicon wafers prior to CVD with titanium, palladium or tungsten, the formation of buried iridium silicide layers, and actinide (uranium and thorium) doping of III-V compounds. 16 refs., 6 figs

  14. Coloration of natural beryl by iron ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Khaibullin, R.I. E-mail: rik@kfti.knc.ru; Lopatin, O.N.; Vagizov, F.G.; Bazarov, V.V.; Bakhtin, A.I.; Khaibullin, I.B.; Aktas, B

    2003-05-01

    Natural colorless crystals of Ural beryl were implanted at room temperature with 40 keV Fe{sup +} ions with fluences in the range of 0.5-1.5 x 10{sup 17} ion/cm{sup 2}. As-implanted samples show dark-grey tone due to radiation damage of beryl crystal. Subsequent thermal annealing of irradiated crystals in oxygen at 600 deg. C for 30 min results in the color change, to yellowish or yellow-orange tones with golden luster, depending on value of iron fluence. The nature of beryl coloration was studied by optical absorption, Moessbauer and Rutherford backscattering (RBS) spectroscopes. It was established that the thermal treatment of iron-irradiated beryl lead to inward diffusive redistribution of iron ions. An appearance of optical absorption bands connected with charge-transfers O{sup 2-} {yields} Fe{sub VI}{sup 3+} and O{sup 2-} {yields} Fe{sub IV}{sup 2+}, Fe{sub IV}{sup 3+} determine the yellow tone in colored beryls. Most of implanted iron ions are founded in both tetrahedral Fe{sub IV}{sup 2+} and octahedral Fe{sub VI}{sup 3+} sites where they may substitute beryllium and aluminum host ions by isomorphic way.

  15. The ion implanter of the Institute of Nuclear Physics and its application in the ion engineering; Implantator jonow IFJ i jego wykorzystanie w inzynierii jonowej

    Energy Technology Data Exchange (ETDEWEB)

    Drwiega, M.; Lipinska, E.; Lazarski, S.; Wierba, M.

    1993-09-01

    The device used for ion implantation is described in detail. It is built with the use of electromagnetic ion separator and consists of: ion source, ion beam system, ion mass analyzer and target chamber. The device parameters are also given. 14 refs, 5 figs, 2 tabs.

  16. Detection and reduction of tungsten contamination in ion implantation processes

    International Nuclear Information System (INIS)

    Polignano, M.L.; Galbiati, A.; Grasso, S.; Mica, I.; Barbarossa, F.; Magni, D.

    2016-01-01

    In this paper, we review the results of some studies addressing the problem of tungsten contamination in implantation processes. For some tests, the implanter was contaminated by implantation of wafers with an exposed tungsten layer, resulting in critical contamination conditions. First, DLTS (deep level transient spectroscopy) measurements were calibrated to measure tungsten contamination in ion-implanted samples. DLTS measurements of tungsten-implanted samples showed that the tungsten concentration increases linearly with the dose up to a rather low dose (5 x 10 10 cm -2 ). Tungsten deactivation was observed when the dose was further increased. Under these conditions, ToF-SIMS revealed tungsten at the wafer surface, showing that deactivation was due to surface segregation. DLTS calibration could therefore be obtained in the linear dose regime only. This calibration was used to evaluate the tungsten contamination in arsenic implantations. Ordinary operating conditions and critical contamination conditions of the equipment were compared. A moderate tungsten contamination was observed in samples implanted under ordinary operating conditions. This contamination was easily suppressed by a thin screen oxide. On the contrary, implantations in critical conditions of the equipment resulted in a relevant tungsten contamination, which could be reduced but not suppressed even by a relatively thick screen oxide (up to 150 Aa). A decontamination process consisting of high dose implantations of dummy wafers was tested for its efficiency to remove tungsten and titanium contamination. This process was found to be much more effective for titanium than for tungsten. Finally, DLTS proved to be much more sensitive that TXRF (total reflection X-ray fluorescence) in detecting tungsten contamination. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  17. Detection and reduction of tungsten contamination in ion implantation processes

    Energy Technology Data Exchange (ETDEWEB)

    Polignano, M.L.; Galbiati, A.; Grasso, S.; Mica, I.; Barbarossa, F.; Magni, D. [STMicroelectronics, Agrate Brianza (Italy)

    2016-12-15

    In this paper, we review the results of some studies addressing the problem of tungsten contamination in implantation processes. For some tests, the implanter was contaminated by implantation of wafers with an exposed tungsten layer, resulting in critical contamination conditions. First, DLTS (deep level transient spectroscopy) measurements were calibrated to measure tungsten contamination in ion-implanted samples. DLTS measurements of tungsten-implanted samples showed that the tungsten concentration increases linearly with the dose up to a rather low dose (5 x 10{sup 10} cm{sup -2}). Tungsten deactivation was observed when the dose was further increased. Under these conditions, ToF-SIMS revealed tungsten at the wafer surface, showing that deactivation was due to surface segregation. DLTS calibration could therefore be obtained in the linear dose regime only. This calibration was used to evaluate the tungsten contamination in arsenic implantations. Ordinary operating conditions and critical contamination conditions of the equipment were compared. A moderate tungsten contamination was observed in samples implanted under ordinary operating conditions. This contamination was easily suppressed by a thin screen oxide. On the contrary, implantations in critical conditions of the equipment resulted in a relevant tungsten contamination, which could be reduced but not suppressed even by a relatively thick screen oxide (up to 150 Aa). A decontamination process consisting of high dose implantations of dummy wafers was tested for its efficiency to remove tungsten and titanium contamination. This process was found to be much more effective for titanium than for tungsten. Finally, DLTS proved to be much more sensitive that TXRF (total reflection X-ray fluorescence) in detecting tungsten contamination. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  18. N and Cr ion implantation of natural ruby surfaces and their characterization

    Energy Technology Data Exchange (ETDEWEB)

    Rao, K. Sudheendra; Sahoo, Rakesh K.; Dash, Tapan [CSIR-Institute of Minerals and Materials Technology, Bhubaneswar 751013 (India); Magudapathy, P.; Panigrahi, B.K. [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102 (India); Nayak, B.B.; Mishra, B.K. [CSIR-Institute of Minerals and Materials Technology, Bhubaneswar 751013 (India)

    2016-04-15

    Highlights: • Cr and N ion implantation on natural rubies of low aesthetic quality. • Cr-ion implantation improves colour tone from red to deep red (pigeon eye red). • N-ion implantation at fluence of 3 × 10{sup 17} causes blue coloration on surface. • Certain extent of amorphization is observed in the case of N-ion implantation. - Abstract: Energetic ions of N and Cr were used to implant the surfaces of natural rubies (low aesthetic quality). Surface colours of the specimens were found to change after ion implantation. The samples without and with ion implantation were characterized by diffuse reflectance spectra in ultra violet and visible region (DRS-UV–Vis), field emission scanning electron microscopy (FESEM), selected area electron diffraction (SAED) and nano-indentation. While the Cr-ion implantation produced deep red surface colour (pigeon eye red) in polished raw sample (without heat treatment), the N-ion implantation produced a mixed tone of dark blue, greenish blue and violet surface colour in the heat treated sample. In the case of heat treated sample at 3 × 10{sup 17} N-ions/cm{sup 2} fluence, formation of colour centres (F{sup +}, F{sub 2}, F{sub 2}{sup +} and F{sub 2}{sup 2+}) by ion implantation process is attributed to explain the development of the modified surface colours. Certain degree of surface amorphization was observed to be associated with the above N-ion implantation.

  19. The compaction of fused silica resulting from ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, C.M.; Ridgway, M.C. [Australian National Univ., Canberra, ACT (Australia); Leech, P.L. [Telstra Research Laboratories, Clayton, Victoria (Australia)

    1996-12-31

    Ion implantation of fused silica results in compaction and consequently an increase in refractive index. This method of modifying the near-surface region has been shown as a potential means for fabricating single mode channel waveguides. This study has measured the compaction of the implanted regions for Si implantations as a function of dose (2x10{sup 12} - 6x10{sup l6} ions/cm{sup 2}), energy (1-9 MeV) and post-implantation annealing temperature (200-900 degree C). For a given energy, a dose-dependence of the step height (depth of compacted region) is observed for doses less than {approx}10{sup 15} ions/cm{sup 2}. At higher doses the step height saturates. For a given dose, a linear trend is evident for the step height as a function of energy suggesting that the major mechanism for this compaction is electronic stopping. As the annealing temperature increases, the step height gradually decreases from {approx}0.1-0.2 {mu} to -10-20% of the original value. From the annealing data, it is possible to extract an activation energy of 0.08 eV associated with the thermal removal of the compacted region. 4 refs., 4 figs.

  20. Industrial hygiene and control technology assessment of ion implantation operations

    International Nuclear Information System (INIS)

    Ungers, L.J.; Jones, J.H.

    1986-01-01

    Ion implantation is a process used to create the functional units (pn junctions) of integrated circuits, photovoltaic (solar) cells and other semiconductor devices. During the process, ions of an impurity or a dopant material are created, accelerated and imbedded in wafers of silicon. Workers responsible for implantation equipment are believed to be at risk from exposure to both chemical (dopant compounds) and physical (ionizing radiation) agents. In an effort to characterize the chemical exposures, monitoring for chemical hazards was conducted near eleven ion implanters at three integrated circuit facilities, while ionizing radiation was monitored near four of these units at two of the facilities. The workplace monitoring suggests that ion implantation operators routinely are exposed to low-level concentrations of dopants. Although the exact nature of dopant compounds released to the work environment was not determined, area and personal samples taken during normal operating activities found concentrations of arsenic, boron and phosphorous below OSHA Permissible Exposure Limits (PELs) for related compounds; area samples collected during implanter maintenance activities suggest that a potential exists for more serious exposures. The results of badge dosimetry monitoring for ionizing radiation indicate that serious exposures are unlikely to occur while engineering controls remain intact. All emissions were detected at levels unlikely to result in exposures above the OSHA standard for the whole body (1.25 rems per calendar quarter). The success of existing controls in preventing worker exposures is discussed. Particular emphasis is given to the differential exposures likely to be experienced by operators and maintenance personnel.(ABSTRACT TRUNCATED AT 250 WORDS)

  1. Formation of Schottky junctions in silicon by ion implantation

    International Nuclear Information System (INIS)

    Bollmann, J.; Klose, H.; Mertens, A.

    1986-01-01

    In order to study the direct formation of a rectifying contact with Schottky junction properties low-energy high-dose silver ion implantations (E = 10 keV, D = 6 x 10 16 cm -2 ) were carried out in Czochralski-grown n- and p-type silicon (0.01 to 15 Ωcm) at 77 and 300 K, respectively. After the implantation an Al or Ag film was vacuum deposited in the same target chamber. The process-induced deep defect centers as well as their depth distribution and annealing behaviour were investigated by measuring electrical characteristics and deep level transient spectra

  2. 4-rod RFQ linac for ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Fujisawa, Hiroshi; Hamamoto, Nariaki; Inouchi, Yutaka [Nisshin Electric Co. Ltd., Kyoto (Japan)

    1997-03-01

    A 34 MHz 4-rod RFQ linac system has been upgraded in both its rf power efficiency and beam intensity. The linac is able to accelerate in cw operation 0.83 mA of a B{sup +} ion beam from 0.03 to 0.91 MeV with transmission of 61 %. The rf power fed to the RFQ is 29 kW. The unloaded Q-value of the RFQ has been improved approximately 61 % to 5400 by copper-plating stainless steel cooling pipes in the RFQ cavity. (author)

  3. Ion Implantation of Wide Bandgap Semiconductors.

    Science.gov (United States)

    1978-05-01

    u s i n g nomina l l v • S’~ xi lane in UHP argon and r o u g h ly eq u i va l e n t system cond it ions. We probably obtained a h o t t i t ’ of...dilute silane that is more c o nce n t rat e d han t he nomina l 1 .5Z reques ted . Both Auger ana l vs is and Rut her f o rd b ackscu t t er ing

  4. Surface modification technique of structural ceramics: ion implantation-assisted multi-arc ion plating

    International Nuclear Information System (INIS)

    Peng Zhijian; Miao Hezhuo; Si Wenjie; Qi Longhao; Li Wenzhi

    2003-01-01

    Through reviewing the advantages and disadvantages of the existed surface modification techniques, a new technique, ion implantation-assisted multi-arc ion plating, was proposed. Using the proposed technique, the surfaces of silicon nitride ceramics were modified by Ti ion implantation, and then three kinds of ternary coatings, (Ti,Al)N, (Ti,Zr)N and (Ti,Cr)N, were deposited on the as-implanted ceramics. The coatings prepared by this technique are of high-hardness and well adhesive to the ceramic substrates. The maximal hardness measured by nanoindentation tests is more than 40 GPa. The maximal critical load by nanoscratch tests is more than 60 mN. The cutting tools prepared by this technique with the presented coatings are of excellent performance in industrial applications. The technique may be promising for the surface modification of structural ceramics. (orig.)

  5. Long-wavelength germanium photodetectors by ion implantation

    International Nuclear Information System (INIS)

    Wu, I.C.; Beeman, J.W.; Luke, P.N.; Hansen, W.L.; Haller, E.E.

    1990-11-01

    Extrinsic far-infrared photoconductivity in thin high-purity germanium wafers implanted with multiple-energy boron ions has been investigated. Initial results from Fourier transform spectrometer(FTS) measurements have demonstrated that photodetectors fabricated from this material have an extended long-wavelength threshold near 192μm. Due to the high-purity substrate, the ability to block the hopping conduction in the implanted IR-active layer yields dark currents of less than 100 electrons/sec at temperatures below 1.3 K under an operating bias of up to 70 mV. Optimum peak responsivity and noise equivalent power (NEP) for these sensitive detectors are 0.9 A/W and 5 x 10 -16 W/Hz 1/2 at 99 μm, respectively. The dependence of the performance of devices on the residual donor concentration in the implanted layer will be discussed. 12 refs., 4 figs

  6. Copper nanoparticles synthesized in polymers by ion implantation

    DEFF Research Database (Denmark)

    Popok, Vladimir; Nuzhdin, Vladimir; Valeev, Valerij

    2015-01-01

    Polymethylmethacrylate (PMMA) and polyimide (PI) samples are implanted by 40 keV Cu+ ions with high fluences in order to synthesize copper nanoparticles in shallow polymer layers. The produced metal/polymer nanocomposites are studied using atomic force and scanning electron microscopies as well...... as optical transmission spectroscopy. It is found that copper nanoparticles nucleation and growth are strongly fluence dependent as well as they are affected by the polymer properties, in particular, by radiation stability yielding different nanostructures for the implanted PI and PMMA. Shallow synthesized...... nanoparticles are observed to partly tower above the sample surface due to a side effect of high-fluence irradiation leading to considerable sputtering of polymers. Implantation and particle formation significantly change optical properties of both polymers reducing transmittance in the UV-visible range due...

  7. Retention of ion-implanted deuterium in tungsten pre-irradiated with carbon ions

    International Nuclear Information System (INIS)

    Alimov, V.Kh.; Ertl, K.; Roth, J.; Schmid, K.

    2000-01-01

    Deuterium (D) ion implantation and retention at room temperature was studied in pure and carbon (C) implanted tungsten single crystals. Pre-implantation with C was done at 40 keV and D implantation at 10 keV with the range confined in the carbon modified layer and at 100 keV with the range exceeding the carbon modified layer. The range distributions were investigated in situ using 1 MeV 3 He ions analysing the energy distributions of α particles from the D( 3 He,p)α reaction while the total amount of retained D was obtained from the p-integral. The range distribution of carbon was obtained from the backscattered 3 He energy distribution. C pre-impantation influences the D retention only if the range of the D ions is confined within the carbon modified surface layer. In this case, D diffusion beyond the ion range distribution does not occur and the retained D amount is smaller than in the pure W crystal. At D energies exceeding the carbon modified layer the retention occurs in the dislocation zone up to 1 μm and the total retained amount is the same for carbon implanted and pure W samples

  8. Rapid Thermal annealing of silicon layers amorphized by ion implantation

    International Nuclear Information System (INIS)

    Hasenack, C.M.

    1986-01-01

    The recrystallization behavior and the supression mechanisms of the residual defects of silicon layers amorphized by ion implantation, were investigated. The samples were annealed with the aid of a rapid thermal annealing (RTA) system at temperature range from 850 to 1200 0 C, and annealing time up to 120 s. Random and aligned Rutherford backscattering spectroscopy were used to analyse the samples. Similarities in the recrystallization behavior for layers implanted with ions of the same chemical groups such as As or Sb; Ge, Sn or Pb, In or Ga, are observed. The results show that the effective supression of resisual defects of the recrystallired layers is vinculated to the redistribution of impurities via thermal diffusion. (author) [pt

  9. Radio-frequency linear accelerators for commercial ion implanters

    International Nuclear Information System (INIS)

    Glavish, H.F.

    1987-01-01

    There is now a demand for production-type ion implanters capable of delivering high beam current at energies in the MeV range. Hitherto, this application has been fulfilled only with dc machines of somewhat limited beam current. A recently developed radio-frequency linear accelerator has produced much higher beam currents yet is just as flexible as a dc machine in the sense that within seconds it can be programmed to accelerate any particle in the range of boron to antimony, to any selected final energy. Included in this review is a discussion of the general principles of rf acceleration including factors which determine the accelerating voltage gradient, energy spread, space charge limits, radial focusing, and the flexibility derived from independent rf phase control of individual rf accelerating cells. Various structures such as the 'two gap' resonator and the rf quadrupole are considered in relation to ion implantation applications. (orig.)

  10. Mechanical properties of ion-beam-textured surgical implant alloys

    Science.gov (United States)

    Weigand, A. J.

    1977-01-01

    An electron-bombardment Hg ion thruster was used as an ion source to texture surfaces of materials used to make orthopedic and/or dental prostheses or implants. The materials textured include 316 stainless steel, titanium-6% aluminum, 4% vanadium, and cobalt-20% chromium, 15% tungsten. To determine the effect of ion texturing on the ultimate strength and yield strength, stainless steel and Co-Cr-W alloy samples were tensile tested to failure. Three types of samples of both materials were tested. One type was ion-textured (the process also heats each sample to 300 C), another type was simply heated to 300 C in an oven, and the third type was untreated. Stress-strain diagrams, 0.2% offset yield strength data, total elongation data, and area reduction data are presented. Fatigue specimens of ion textured and untextured 316 stainless steel and Ti-6% Al-4% V were tested. Included as an ion textured sample is a Ti-6% Al-4% V sample which was ion machined by means of Ni screen mask so as to produce an array of 140 mu m x 140 mu m x 60 mu m deep pits. Scanning electron microscopy was used to characterize the ion textured surfaces.

  11. Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions

    International Nuclear Information System (INIS)

    Li Dexing; Zhang Jizhong; Yu Miao; Kang Jianchang; Li Wenzhi

    2005-01-01

    High purity alumina ceramics (99% Al 2 O 3 ) was implanted by copper ion and titanium ion in a metal vapour vacuum arc (MEVVA) implanter, respectively. The influence of implantation parameters was studied varying ion fluence. The samples were implanted by 68 keV Cu ion and 82 keV Ti ion with fluences from 1 x 10 15 to 1 x 10 18 ions/cm 2 , respectively. The as-implanted samples were investigated by scanning electron microscopy (SEM), glancing X-ray diffraction (GXRD), scanning Auger microscopy (SAM), and four-probe method. Different morphologies were observed on the surfaces of the as-implanted samples and clearly related to implantation parameters. For both ion implantations, the sheet resistances of the alumina samples implanted with Cu and Ti ion fluences of 1 x 10 18 ions/cm 2 , respectively, reached the corresponding minimum values because of the surface metallization. The experimental results indicate that the high-fluence ion implantation resulted in conductive layer on the surface of the as-implanted high purity alumina ceramics

  12. Radioactive ion implantation as a tool for wear measurements

    International Nuclear Information System (INIS)

    Bagger, C.; Soerensen, G.

    1979-01-01

    The present paper deals with ion implantation of radioactive krypton ions in surfaces with aim of measuring wear of different magnetic materials in sound-heads. The technique is especially suited for a relatively fast comparison of wear-characteristics of materials of varying composition in small inaccessible areas. In the present case utilisation of a 60 KeV accelerator allows determination of a total wear as small as 0.05 μm with an accuracy of 10%. Further the technique yields information of the time dependence of the wear process with an accuracy less than 0.001 μm. (author)

  13. Synthesis of dilute magnetic semiconductors by ion implantation

    International Nuclear Information System (INIS)

    Braunstein, G.H.; Dresselhaus, G.; Withrow, S.P.

    1986-01-01

    We have synthesized layers of CdMnTe by implantation of Mn into CdTe. Samples of CdTe have been implanted with Mn ions of 60 keV energy to fluences in the range 1 x 10 13 cm -2 to 2 x 10 16 cm -2 resulting in local concentrations of up to 10% at the maximum of the Mn distribution. Rutherford backscattering-channeling analysis has been used to study the radiation damage after implantation and after subsequent rapid thermal annealing (RTA). These experiments reveal that RTA for 15 sec at a temperature T greater than or equal to 700 0 C results in the complete recovery of the lattice order, without affecting the stoichiometry of CdTe. Photoluminescence (PL) measurements of a sample showing complete annealing reveal an increase in the band gap corresponding to the synthesis of very dilute (x approx. = 0.004) Cd/sub 1-x/Mn/sub x/Te. A shift of the excitonic PL peak to lower energies is observed when a magnetic field H less than or equal to 1T is applied. These measurements provide clear evidence for the synthesis of a DMS by ion implantation of Mn into CdTe

  14. Swept Line Electron Beam Annealing of Ion Implanted Semiconductors.

    Science.gov (United States)

    1982-07-01

    a pre- liminary study using silicon solar cells. This work was undertaken in cooperation with Dr. J. Eguren of the Instituto De Energia Solar , Madrid...device fabrication has been attempted. To date, resistors, capacitors, diodes, bipolar transistors, MOSFEs, and solar cells have been fabricated with...34 " 48 *Si Solar Cells Ruby PL P+ Ion-Implanted 49 Ruby PL Pulsed Diffused 50 :C

  15. Erbium ion implantation into different crystallographic cuts of lithium niobate

    Czech Academy of Sciences Publication Activity Database

    Nekvindová, P.; Švecová, B.; Cajzl, J.; Macková, Anna; Malinský, Petr; Oswald, Jiří; Kolitsch, A.; Špirková, J.

    2012-01-01

    Roč. 34, č. 4 (2012), s. 652-659 ISSN 0925-3467 R&D Projects: GA MŠk(CZ) LC06041; GA ČR GA106/09/0125; GA ČR(CZ) GAP106/10/1477 Institutional research plan: CEZ:AV0Z10480505; CEZ:AV0Z10100521 Keywords : Lithium niobate * Erbium * Ion implantation * Luminescence Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.918, year: 2012

  16. Highly antibacterial UHMWPE surfaces by implantation of titanium ions

    Energy Technology Data Exchange (ETDEWEB)

    Delle Side, D., E-mail: domenico.delleside@le.infn.it [LEAS, Dipartimento di Matematica e Fisica “Ennio de Giorgi”, Università del Salento, Lecce (Italy); Istituto Nazionale di Fisica Nucleare – Sezione di Lecce, Lecce (Italy); Nassisi, V.; Giuffreda, E.; Velardi, L. [LEAS, Dipartimento di Matematica e Fisica “Ennio de Giorgi”, Università del Salento, Lecce (Italy); Istituto Nazionale di Fisica Nucleare – Sezione di Lecce, Lecce (Italy); Alifano, P.; Talà, A.; Tredici, S.M. [Dipartimento di Scienze e Tecnologie Biologiche ed Ambientali, Università del Salento, Lecce (Italy)

    2014-07-15

    The spreading of pathogens represents a serious threat for human beings. Consequently, efficient antimicrobial surfaces are needed in order to reduce risks of contracting severe diseases. In this work we present the first evidences of a new technique to obtain a highly antibacterial Ultra High Molecular Weight Polyethylene (UHMWPE) based on a non-stoichiometric titanium oxide coating, visible-light responsive, obtained through ion implantation.

  17. Highly antibacterial UHMWPE surfaces by implantation of titanium ions

    Science.gov (United States)

    Delle Side, D.; Nassisi, V.; Giuffreda, E.; Velardi, L.; Alifano, P.; Talà, A.; Tredici, S. M.

    2014-07-01

    The spreading of pathogens represents a serious threat for human beings. Consequently, efficient antimicrobial surfaces are needed in order to reduce risks of contracting severe diseases. In this work we present the first evidences of a new technique to obtain a highly antibacterial Ultra High Molecular Weight Polyethylene (UHMWPE) based on a non-stoichiometric titanium oxide coating, visible-light responsive, obtained through ion implantation.

  18. Plasma source ion implantation of ammonia into electroplated chromium

    International Nuclear Information System (INIS)

    Scheuer, J.T.; Walter, K.C.; Rej, D.J.; Nastasi, M.; Blanchard, J.P.

    1995-01-01

    Ammonia gas (NH 3 ) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 x 10 17 N-at/cm 2 is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4

  19. Er+ medium energy ion implantation into lithium niobate

    Czech Academy of Sciences Publication Activity Database

    Švecová, B.; Nekvindová, P.; Macková, Anna; Oswald, Jiří; Vacík, Jiří; Grotzschel, R.; Spirkova, J.

    2009-01-01

    Roč. 267, 8-9 (2009), s. 1332-1335 ISSN 0168-583X R&D Projects: GA MŠk(CZ) LC06041; GA AV ČR IAA200480702 Institutional research plan: CEZ:AV0Z10480505; CEZ:AV0Z10100521 Keywords : lithium niobate * erbium * ion implantation Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.156, year: 2009

  20. Doping of silicon carbide by ion implantation; Dopage du carbure de silicium par implantation ionique

    Energy Technology Data Exchange (ETDEWEB)

    Gimbert, J

    1999-03-04

    It appeared that in some fields, as the hostile environments (high temperature or irradiation), the silicon compounds showed limitations resulting from the electrical and mechanical properties. Doping of 4H and 6H silicon carbide by ion implantation is studied from a physicochemical and electrical point of view. It is necessary to obtain n-type and p-type material to realize high power and/or high frequency devices, such as MESFETs and Schottky diodes. First, physical and electrical properties of silicon carbide are presented and the interest of developing a process technology on this material is emphasised. Then, physical characteristics of ion implantation and particularly classical dopant implantation, such as nitrogen, for n-type doping, and aluminium and boron, for p-type doping are described. Results with these dopants are presented and analysed. Optimal conditions are extracted from these experiences so as to obtain a good crystal quality and a surface state allowing device fabrication. Electrical conduction is then described in the 4H and 6H-SiC polytypes. Freezing of free carriers and scattering processes are described. Electrical measurements are carried out using Hall effect on Van der Panw test patterns, and 4 point probe method are used to draw the type of the material, free carrier concentrations, resistivity and mobility of the implanted doped layers. These results are commented and compared to the theoretical analysis. The influence of the technological process on electrical conduction is studied in view of fabricating implanted silicon carbide devices. (author)

  1. Nanoscale patterns produced by self-sputtering of solid surfaces: The effect of ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Bradley, R. Mark [Department of Physics, Colorado State University, Fort Collins, Colorado 80523 (United States); Hofsäss, Hans [II. Physikalisches Institut, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany)

    2016-08-21

    A theory of the effect that ion implantation has on the patterns produced by ion bombardment of solid surfaces is introduced. For simplicity, the case of self-sputtering of an elemental material is studied. We find that implantation of self-ions has a destabilizing effect along the projected beam direction for angles of incidence θ that exceed a critical value. In the transverse direction, ion implantation has a stabilizing influence for all θ.

  2. Target-ion source unit ionization efficiency measurement by method of stable ion beam implantation

    CERN Document Server

    Panteleev, V.N; Fedorov, D.V; Moroz, F.V; Orlov, S.Yu; Volkov, Yu.M

    The ionization efficiency is one of the most important parameters of an on-line used target-ion source system exploited for production of exotic radioactive beams. The ionization efficiency value determination as a characteristic of a target-ion source unit in the stage of its normalizing before on-line use is a very important step in the course of the preparation for an on-line experiment. At the IRIS facility (Petersburg Nuclear Physics Institute, Gatchina) a reliable and rather precise method of the target-ion source unit ionization efficiency measurement by the method of stable beam implantation has been developed. The method worked out exploits an off-line mass-separator for the implantation of the ion beams of selected stable isotopes of different elements into a tantalum foil placed inside the Faraday cup in the focal plane of the mass-separator. The amount of implanted ions has been measured with a high accuracy by the current integrator connected to the Faraday cup. After the implantation of needed a...

  3. Architecture and control of a high current ion implanter system

    International Nuclear Information System (INIS)

    Bayer, E.H.; Paul, L.F.; Kranik, J.R.

    1979-01-01

    The design of an ion implant system for use in production requires that special attention be given to areas of design which normally are not emphasized on research or development type ion implanters. Manually operated, local controls are replaced by remote controls, automatic sequencing, and digital displays. For ease of maintenance and replication the individual components are designed as simply as possible and are contained in modules of separate identities, joined only by the beam line and electrical interconnections. A production environment also imposes requirements for the control of contamination and maintainability of clean room integrity. For that reason the major portion of the hardware is separated from the clean operator area and is housed in a maintenance core area. The controls of a production system should also be such that relatively unskilled technicians are able to operate the system with optimum repeatability and minimum operator intervention. An extensive interlock system is required. Most important, for use in production the ion implant system has to have a relatively high rate of throughput. Since the rate of throughput at a given dose is a function of beam current, pumpdown time and wafer handling capacity, design of components affecting these parameters has been optimized. Details of the system are given. (U.K.)

  4. Homojunction silicon solar cells doping by ion implantation

    Science.gov (United States)

    Milési, Frédéric; Coig, Marianne; Lerat, Jean-François; Desrues, Thibaut; Le Perchec, Jérôme; Lanterne, Adeline; Lachal, Laurent; Mazen, Frédéric

    2017-10-01

    Production costs and energy efficiency are the main priorities for the photovoltaic (PV) industry (COP21 conclusions). To lower costs and increase efficiency, we are proposing to reduce the number of processing steps involved in the manufacture of N-type Passivated Rear Totally Diffused (PERT) silicon solar cells. Replacing the conventional thermal diffusion doping steps by ion implantation followed by thermal annealing allows reducing the number of steps from 7 to 3 while maintaining similar efficiency. This alternative approach was investigated in the present work. Beamline and plasma immersion ion implantation (BLII and PIII) methods were used to insert n-(phosphorus) and p-type (boron) dopants into the Si substrate. With higher throughput and lower costs, PIII is a better candidate for the photovoltaic industry, compared to BL. However, the optimization of the plasma conditions is demanding and more complex than the beamline approach. Subsequent annealing was performed on selected samples to activate the dopants on both sides of the solar cell. Two annealing methods were investigated: soak and spike thermal annealing. Best performing solar cells, showing a PV efficiency of about 20%, was obtained using spike annealing with adapted ion implantation conditions.

  5. Temperature behavior of damage in sapphire implanted with light ions

    Energy Technology Data Exchange (ETDEWEB)

    Alves, E. [Ion Beam Laboratory, Instituto Tecnologico e Nuclear, Sacavem 2686-953 (Portugal); Centro de Fisica Nuclear da Universidade de Lisboa, Lisbon (Portugal)], E-mail: ealves@itn.pt; Marques, C. [Ion Beam Laboratory, Instituto Tecnologico e Nuclear, Sacavem 2686-953 (Portugal); Centro de Fisica Nuclear da Universidade de Lisboa, Lisbon (Portugal); Safran, G. [Research Institute for Technical Physics and Materials Science, H-1525 Budapest (Hungary); McHargue, Carl J. [University of Tennessee, Knoxville, TN 37996-0750 (United States)

    2009-05-01

    In this study, we compare and discuss the defect behavior of sapphire single crystals implanted with different fluences (1 x 10{sup 16}-1 x 10{sup 17} cm{sup -2}) of carbon and nitrogen with 150 keV. The implantation temperatures were RT, 500 deg. C and 1000 deg. C to study the influence of temperature on the defect structures. For all the ions the Rutherford backscattering-channeling (RBS-C) results indicate a surface region with low residual disorder in the Al-sublattice. Near the end of range the channeled spectrum almost reaches the random indicating a high damage level for fluences of 1 x 10{sup 17} cm{sup -2}. The transmission electron microscopy (TEM) photographs show a layered contrast feature for the C implanted sample where a buried amorphous region is present. For the N implanted sample the Electron Energy Loss Spectroscopy (EELS) elemental mapping give evidence for the presence of a buried damage layer decorated with bubbles. Samples implanted at high temperatures (500 deg. C and 1000 deg. C) show a strong contrast fluctuation indicating a defective crystalline structure of sapphire.

  6. Low energy ion implantation and high energy heavy ion irradiation in C60 films

    International Nuclear Information System (INIS)

    Narayanan, K.L.; Yamaguchi, M.; Dharmarasu, N.; Kojima, N.; Kanjilal, D.

    2001-01-01

    C 60 films have been bombarded with low energy boron ions and high energy swift heavy ions (SHI) of silver and oxygen at different doses. Raman scattering and Fourier transform infrared (FTIR) studies were carried out on the virgin and irradiated films and the results are in good agreement with each other. The films subject to low energy boron ion implantation showed destruction of the bukky balls whereas the films subject to high energy ion irradiation did not show appreciable effects on their structure. These results indicate that C 60 films are more prone to defects by elastic collision and subsequent implantation at lower energy. Irradiation at higher energy was less effective in creating appreciable defects through electronic excitation by inelastic collisions at similar energy density

  7. Metallic ion release after knee prosthesis implantation: a prospective study.

    Science.gov (United States)

    Lons, Adrien; Putman, Sophie; Pasquier, Gilles; Migaud, Henri; Drumez, Elodie; Girard, Julien

    2017-12-01

    Metal-on-metal (MoM) hip replacement bearings produce metallic ions that can cause health complications. Metallic release also occurs with other materials, but data on metallic ion levels after knee arthroplasty are sparse. We postulate that knee replacement generates elevating metallic ions (chromium (Cr), cobalt (Co) and titanium (Ti)) during the first year after implantation. This ongoing prospective study included all patients who underwent the same type of knee arthroplasty between May and December 2013. Cr, Co and Ti levels were measured in whole blood at pre-operation and one-year follow-up (6 and 12 months). Clinical and radiographic data (range of motion, Oxford, International Knee Society (IKS) and satisfaction scores) were recorded. In 90 patients, preoperative Cr, Co and Ti metallic ion levels were respectively 0.45 μg/l, 0.22 μg/l, 2.94 μg/l and increased to 1.27 μg/l, 1.41 μg/l, 4.08 μg/l (p < 0.0001) at last one-year follow-up. Mean Oxford and IKS scores rose, respectively, from 45.9 (30-58) and 24.9 (12-52) to 88.3 (0-168) and 160.8 (93-200) (p < 0.001). After the implantation of knee arthroplasty, we found significant blood elevation of Cr, Co and Ti levels one year after implantation exceeding the normal values. This metallic ion release could lead to numerous effects: allergy, hypersensitivity, etc.

  8. Design of a Porous Cathode for Ultrahigh Performance of a Li-ion Battery: An Overlooked Pore Distribution

    Science.gov (United States)

    Song, Jihwan; Kim, Junhyung; Kang, Taewook; Kim, Dongchoul

    2017-01-01

    Typical cathode materials of Li-ion battery suffer from a severe loss in specific capacity, and this problem is regarded as a major obstacle in the expansion of newer applications. To overcome this, porous cathodes are being extensively utilized. However, although it seems that the porosity in the cathode would be a panacea for high performance of LIBs, there is a blind point in the cathode consisting of porous structures, which makes the porous design to be a redundant. Here, we report the importance of designing the porosity of a cathode in obtaining ultrahigh performance with the porous design or a degraded performance even with increase of porosity. Numerical simulations show that the cathode with 40% porosity has 98% reduction in the loss of specific capacity when compared to the simple spherical cathode when the C-rate increases from 2.5 to 80 C. In addition, the loss over total cycles decreases from 30% to only about 1% for the cathode with 40% porosity under 40 C. Interestingly, however, the specific capacity could be decreased even with the increase in porosity unless the pores were evenly distributed in the cathode. The present analysis provides an important insight into the design of ultrahigh performance cathodes. PMID:28211894

  9. Si-nanoparticle synthesis using ion implantation and MeV ion irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Chulapakorn, T.; Wolff, M.; Primetzhofer, D.; Possnert, G. [Uppsala University, Department of Physics and Astronomy, P.O. Box 516, 751 20 Uppsala (Sweden); Sychugov, I.; Suvanam, S.S.; Linnros, J. [Royal Institute of Technology, School of Information and Communication Technology, P.O. Box Electrum 229, 164 40 Kista (Sweden); Hallen, A. [Uppsala University, Department of Physics and Astronomy, P.O. Box 516, 751 20 Uppsala (Sweden); Royal Institute of Technology, School of Information and Communication Technology, P.O. Box Electrum 229, 164 40 Kista (Sweden)

    2015-12-15

    A dielectric matrix with embedded Si-nanoparticles may show strong luminescence depending on nanoparticles size, surface properties, Si-excess concentration and matrix type. Ion implantation of Si ions with energies of a few tens to hundreds of keV in a SiO{sub 2} matrix followed by thermal annealing was identified as a powerful method to form such nanoparticles. The aim of the present work is to optimize the synthesis of Si-nanoparticles produced by ion implantation in SiO{sub 2} by employing MeV ion irradiation as an additional annealing process. The luminescence properties are measured by spectrally resolved photoluminescence including PL lifetime measurement, while X-ray reflectometry, atomic force microscopy and ion beam analysis are used to characterize the nanoparticle formation process. The results show that the samples implanted at 20%-Si excess atomic concentration display the highest luminescence and that irradiation of 36 MeV {sup 127}I ions affects the luminosity in terms of wavelength and intensity. It is also demonstrated that the nanoparticle luminescence lifetime decreases as a function of irradiation fluence. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  10. Effects of ion-implanted C on the microstructure and surface mechanical properties of Fe alloys implanted with Ti

    International Nuclear Information System (INIS)

    Follstaedt, D.M.; Knapp, J.A.; Pope, L.E.; Yost, F.G.; Picraux, S.T.

    1984-01-01

    The microstructural and tribological effects of ion implanting C into Ti-implanted, Fe-based alloys are examined and compared to the influence of C introduced by vacuum carburization during Ti implantation alone. The amorphous surface alloy formed by Ti implantation of pure Fe increases in thickness when additional C is implanted at depths containing Ti but beyond the range of carburization. Pin-on-disc tests of 15-5 PH stainless steel show that implantation of both Ti and C reduces friction significantly under conditions where no reduction is obtained by Ti implantation alone; wear depths are also less when C is implanted. All available experimental results can be accounted for by consideration of the thickness and Ti concentration of the amorphous Fe-Ti-C alloy. The thicker amorphous layer on samples implanted with additional C extends tribological benefits to more severe wear regimes

  11. Simultaneous generation of ions and high-order harmonics from thin conjugated polymer foil irradiated with ultrahigh contrast laser

    Energy Technology Data Exchange (ETDEWEB)

    Choi, I. W.; Kim, I J.; Pae, K. H.; Nam, K. H.; Lee, C.-L.; Yun, H.; Kim, H. T.; Lee, S. K.; Yu, T. J.; Sung, J. H.; Lee, J. [Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju 500-712 (Korea, Republic of); Pirozhkov, A. S.; Ogura, K.; Orimo, S.; Daido, H. [Quantum Beam Science Directorate, Japan Atomic Energy Agency, Kizugawa, Kyoto 619-0215 (Japan)

    2011-10-31

    We report the manufacturing of an (ultra-)thin foil target made of conjugated polymer, poly(9,9'-dioctylfluorene-co-benzothiadiazole) (F8BT), and the simultaneous observation of laser-accelerated ions and second harmonic radiation, when irradiated with ultrahigh-contrast laser pulse at a maximum intensity of 4 x 10{sup 19 }W/cm{sup 2}. Maximum proton energy of 8 MeV is achieved along the target normal direction. Strong second harmonic with over 6% energy ratio compared to fundamental is emitted along the specular direction. Two-dimensional particle-in-cell simulations confirm the simultaneous generation of protons and high-order harmonics, which demonstrates the feasibility of applications requiring particle and radiation sources at once, effectively using the same laser and target.

  12. Modification of anti-bacterial surface properties of textile polymers by vacuum arc ion source implantation

    Energy Technology Data Exchange (ETDEWEB)

    Nikolaev, A.G., E-mail: nik@opee.hcei.tsc.ru [High Current Electronics Institute, Siberian Branch of the Russian Academy of Sciences, Tomsk 634055 (Russian Federation); Yushkov, G.Yu.; Oks, E.M. [High Current Electronics Institute, Siberian Branch of the Russian Academy of Sciences, Tomsk 634055 (Russian Federation); Oztarhan, A. [Izmir University, Izmir 35140 (Turkey); Akpek, A.; Hames-Kocabas, E.; Urkac, E.S. [Bioengineering Department, Ege University, Bornova 35100, Izmir (Turkey); Brown, I.G. [Lawrence Berkeley National Laboratory, Berkeley, CA 94708 (United States)

    2014-08-15

    Highlights: • Ion implantation. • Anti-bacterial properties. • Textile polymer. • Vacuum arc ion source. - Abstract: Ion implantation provides an important technology for the modification of material surface properties. The vacuum arc ion source is a unique instrument for the generation of intense beams of metal ions as well as gaseous ions, including mixed metal–gas beams with controllable metal:gas ion ratio. Here we describe our exploratory work on the application of vacuum arc ion source-generated ion beams for ion implantation into polymer textile materials for modification of their biological cell compatibility surface properties. We have investigated two specific aspects of cell compatibility: (i) enhancement of the antibacterial characteristics (we chose to use Staphylococcus aureus bacteria) of ion implanted polymer textile fabric, and (ii) the “inverse” concern of enhancement of neural cell growth rate (we chose Rat B-35 neuroblastoma cells) on ion implanted polymer textile. The results of both investigations were positive, with implantation-generated antibacterial efficiency factor up to about 90%, fully comparable to alternative conventional (non-implantation) approaches and with some potentially important advantages over the conventional approach; and with enhancement of neural cell growth rate of up to a factor of 3.5 when grown on suitably implanted polymer textile material.

  13. Procedure for the ion implantation of semiconductor wafers coated with insulating layers

    International Nuclear Information System (INIS)

    Baumann, K.; Tunnat, K.

    1987-01-01

    This invention is directed to the ion implantation of semiconductor wafers coated with insulating layers. The aim is to limit the spark puncturing by the ion beam due to electric charge and thus to protect the component structures. A conductive contact between semiconductor wafer and wafer carrier of the ion implantation facility is established by the partial removal of the insulating layer. 4 figs

  14. Nitrogen ion implantation: Barriers to industrial acceptance and prospects for the future

    International Nuclear Information System (INIS)

    Alexander, R.B.

    1989-01-01

    Nitrogen ion implantation has been used to improve the wear and fatigue resistance of metals in industrial applications since the process was developed at the UK Harwell Laboratory in the 1970s. However, implantation service companies like Ion Surface Technology have found so far that the market for nitrogen implantation is limited. Both market and technical barriers exist to more widespread acceptance in industry. Market factors include cost, industrial conservatism, and production priorities in manufacturing. Technical factors include the size of available implanters, the line-of-sight limitation of ion implantation, sputtering, and other process limitations such as shallow penetration depth. Several recent technical developments that should greatly increase market acceptance are described: 1. large-scale nitrogen implanters, 2. the non-line-of-sight plasma source ion implantation process, and 3. ion assisted coating techniques. (orig.)

  15. Study on the Properties of 1319 nm Ultra-High Reflector Deposited by Electron Beam Evaporation Assisted by an Energetic RF Ion Source

    OpenAIRE

    Songwen Deng; Gang Li; Feng Wang; Qipeng Lv; Long Sun; Yuqi Jin

    2018-01-01

    Ultra-high reflectors, working as a critical optical component, has been widely applied as a cavity mirror in fine optical systems such as laser gyro, F-P interferometer, etc. For decades, ion beam sputtering (IBS) technology, which can deposit ultra-low loss and dense layers, has been commonly believed to be the only and irreplaceable method to fabricate ultra-high reflectors. Thus, reports on other methods are rare and a reflectivity above 99.99% obtained by evaporation technology (includin...

  16. Titanium Nitride and Nitrogen Ion Implanted Coated Dental Materials

    Directory of Open Access Journals (Sweden)

    David W. Berzins

    2012-07-01

    Full Text Available Titanium nitride and/or nitrogen ion implanted coated dental materials have been investigated since the mid-1980s and considered in various applications in dentistry such as implants, abutments, orthodontic wires, endodontic files, periodontal/oral hygiene instruments, and casting alloys for fixed restorations. Multiple methodologies have been employed to create the coatings, but detailed structural analysis of the coatings is generally lacking in the dental literature. Depending on application, the purpose of the coating is to provide increased surface hardness, abrasion/wear resistance, esthetics, and corrosion resistance, lower friction, as well as greater beneficial interaction with adjacent biological and material substrates. While many studies have reported on the achievement of these properties, a consensus is not always clear. Additionally, few studies have been conducted to assess the efficacy of the coatings in a clinical setting. Overall, titanium nitride and/or nitrogen ion implanted coated dental materials potentially offer advantages over uncoated counterparts, but more investigation is needed to document the structure of the coatings and their clinical effectiveness.

  17. Bimodal distribution of damage morphology generated by ion implantation

    International Nuclear Information System (INIS)

    Mok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P.; Benistant, F.

    2005-01-01

    A nucleation and evolution model of damage based on amorphous pockets (APs) has recently been developed and implemented in an atomistic kinetic Monte Carlo simulator. In the model, APs are disordered structures (I n V m ), which are agglomerates of interstitials (I) and vacancies (V). This model has been used to study the composition and size distribution of APs during different ion implantations. Depending strongly on the dose rate, ion mass and implant temperature, the APs can evolve to a defect population where the agglomerates have a similar number of I and V (n ∼ m), or to a defect population with pure I (m ∼ 0) and pure V (n ∼ 0) clusters, or a mixture of APs and clusters. This behaviour corresponds to a bimodal (APs/clusters) distribution of damage. As the AP have different thermal stability compared to the I and V clusters, the same damage concentration obtained through different implant conditions has a different damage morphology and, consequently, exhibit a different resistance to subsequent thermal treatments

  18. Modeling of interstitial diffusion of ion-implanted boron

    International Nuclear Information System (INIS)

    Velichko, O.I.; Knyazheva, N.V.

    2009-01-01

    A model of the interstitial diffusion of ion-implanted boron during rapid thermal annealing of silicon layers previously amorphized by implantation of germanium has been proposed. It is supposed that the boron interstitials are created continuously during annealing due to generation, dissolution, or rearrangement of the clusters of impurity atoms which are formed in the ion-implanted layers with impurity concentration above the solubility limit. The local elastic stresses arising due to the difference of boron atomic radius and atomic radius of silicon also contribute to the generation of boron interstitials. A simulation of boron redistribution during thermal annealing for 60 s at a temperature of 850 C has been carried out. The calculated profile agrees well with the experimental data. A number of the parameters of interstitial diffusion have been derived. In particular, the average migration length of nonequilibrium boron interstitials is equal to 12 nm. It was also obtained that approximately 1.94% of boron atoms were converted to the interstitial sites, participated in the fast interstitial migration, and then became immobile again transferring into a substitutional position or forming the electrically inactive complexes with crystal lattice defects. (authors)

  19. Ion microanalysis and implantation applied to fusion surface research

    International Nuclear Information System (INIS)

    Vook, F.L.; Doyle, B.L.; Picraux, S.T.

    1978-01-01

    Ion microanalysis and implantation have been used to investigate and analyze plasma-surface interactions relevant to fusion plasma materials. Previous results for pure metals are reviewed and new results are presented for TiB 2 coatings for Tokamak surfaces. Enhanced trapping of implanted, low-energy hydrogen has been shown to occur at room temperature in W, Au, Pd, Mo, Nb, and TiB 2 for He or other ion predamage. Hydrogen depth profiles obtained using 1 H( 19 F,αγ) 16 O resonant nuclear reaction show that the H decorates the He damage profiles at traps whose concentration is proportional to the He-induced damage. For room temperature implantation in TiB 2 , H is trapped at the end of range, and isochronal annealing indicates that the H is lost by release from traps followed by rapid diffusion. For He predamaged samples, annealing at 400 0 C causes the H to be retrapped in the region of the He-induced damage at traps whose cross section is approx. = 1.8 x 10 -18 cm 2 /trap

  20. Defect structures of ion-implanted α-tin

    International Nuclear Information System (INIS)

    Petersen, J.W.; Weyer, G.; Damgaard, S.; Nielsen, H.L.

    1980-01-01

    Single crystalline and polycrystalline α-tin has been implanted at the room temperature 80-keV ions of radioactive sup(119m)Sn, 119 Sb, and sup(119m)Te. The radioactive nuclei decay to the Moessbauer level of 119 Sn. Moessbauer spectra of the emitted 24-keV γ radiation have been measured for different source temperatures by resonance counting techniques. Five individual lines in the spectra are characterized mainly by their isomer shifts and Debye temperatures. From these parameters the radiogenic 119 Sn atoms are concluded to be located in regular substitutional and interstitial lattice sites and in defect complexes. Simple models for the defects are proposed: A Sn-vacancy pair consists of Sn atoms on (nearly) substitutional sites with a dangling bond into an adjacent vacancy. In a complex oxygen-containing defect the Sn atoms have approximately a 5s 2 configuration with p-bonds to two nearest neighbour atoms. Sn atoms, having an atomic 5s 2 5p 2 configuration and large vibrational amplitudes, are concluded to be in non-bonding regular interstitial sites. For special implantation conditions minor fractions of SnO 2 molecules are formed in the bulk, The interstitial 119 Sn and the 119 Sn-vacancy pairs are proposed to represent elementary point defects in α-tin. Conclusions are also drawn concerning the lattice location and the defects created in the implantation process by the implanted parent isotopes. (orig.)

  1. The effect of metal ion implantation on the surface mechanical properties of Mylar (PET)

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, W.; Sood, D.K. [Royal Melbourne Inst. of Tech., VIC (Australia); Yao, X.; Brown, I.G. [California Univ., Berkeley, CA (United States). Lawrence Berkeley Lab.

    1993-12-31

    Ion implantation of polymers leads to the formation of new carbonaceous materials, the revolution during implantation of various species consists of (1) ion beam induced damage: chain scission, crosslinking, molecular emission of volatile elements and compounds, stoichiometric change in the surface layer of pristine polymers; and (2) chemical effect between ion and target materials: microalloying and precipitation. Literature regarding ion implanted polymers shows that the reorganisation of the carbon network after implantation can dramatically modify several properties of pristine polymers solubility, molecular weight, and electrical, optical and mechanical properties. However, ion implantation of polymers is actually a very complex interaction which depends on not only ion species, implantation condition, but also polymer type and specific structure. In this paper the effect of Ag or Ti ions implantation on surface mechanical properties of PET (polyethylenne terephthalate) polymer is reported. There was a clear deterioration in wear resistance after implantation of both Ag and Ti ions. It is suggested that the increment of wear after implantation may result from not only ion damage but also chemical effect between ion and target material. 3 refs., 1 tab., 2 figs.

  2. Characterization of low temperature metallic magnetic calorimeters having gold absorbers with implanted $^{163}$Ho ions

    CERN Document Server

    Gastaldo, L.; von Seggern, F.; Porst, J.-P.; Schäfer, S.; Pies, C.; Kempf, S.; Wolf, T.; Fleischmann, A.; Enss, C.; Herlert, A.; Johnston, K.

    2013-01-01

    For the first time we have investigated the behavior of fully micro-fabricated low temperature metallic magnetic calorimeters (MMCs) after undergoing an ion-implantation process. This experiment had the aim to show the possibility to perform a high precision calorimetric measurement of the energy spectrum following the electron capture of $^{163}$Ho using MMCs having the radioactive $^{163}$Ho ions implanted in the absorber. The implantation of $^{163}$Ho ions was performed at ISOLDE-CERN. The performance of a detector that underwent an ion-implantation process is compared to the one of a detector without implanted ions. The results show that the implantation dose of ions used in this experiment does not compromise the properties of the detector. In addition an optimized detector design for future $^{163}$Ho experiments is presented.

  3. Synthesis of optical waveguides in SiO2 by silver ion implantation

    Science.gov (United States)

    Márquez, H.; Salazar, D.; Rangel-Rojo, R.; Angel-Valenzuela, J. L.; Vázquez, G. V.; Flores-Romero, E.; Rodríguez-Fernández, L.; Oliver, A.

    2013-03-01

    Optical waveguides have been obtained by silver ion implantation on fused silica substrates. Silver ion implantation profiles were calculated in a SiO2 matrix with different energies of implantation from 125 keV to 10 MeV. Refractive index change (Δn) of the ion implanted waveguides was calculated as a function of their chemical composition. Optical absorption spectra of waveguides obtained by 9 MeV silver ion implantation, at a dose of 5 × 1016 ions/cm2, exhibit the typical absorption band associated to the surface plasmon resonance of silver nanoparticles. Effective refractive indices of the propagation modes and waveguide propagation losses of silver ion implanted waveguides are also presented.

  4. Planar transistors and impatt diodes with ion implantation

    International Nuclear Information System (INIS)

    Dorendorf, H.; Glawischnig, H.; Grasser, L.; Hammerschmitt, J.

    1975-03-01

    Low frequency planar npn and pnp transistors have been developed in which the base and emitter have been fabricated using ion implantation of boron and phosphorus by a drive-in diffusion. Electrical parameters of the transistors are comparable with conventionally produced transistors; the noise figure was improved and production tolerances were significantly reduced. Silicon-impatt diodes for the microwave range were also fabricated with implanted pn junctions and tested for their high frequency characteristics. These diodes, made in an improved upside down technology, delivered output power up to 40 mW (burn out power) at 30 GHz. Reverse leakage current and current carrying capability of these diodes were comparable to diffused structures. (orig.) 891 ORU 892 MB [de

  5. Scanning probe microscopy of single Au ion implants in Si

    International Nuclear Information System (INIS)

    Vines, L.; Monakhov, E.; Maknys, K.; Svensson, B.G.; Jensen, J.; Hallen, A.; Kuznetsov, A. Yu.

    2006-01-01

    We have studied 5 MeV Au 2+ ion implantation with fluences between 7 x 10 7 and 2 x 10 8 cm -2 in Si by deep level transient spectroscopy (DLTS) and scanning capacitance microscopy (SCM). The DLTS measurements show formation of electrically active defects such as the two negative charge states of the divacancy (V 2 (=/-) and V 2 (-/0)) and the vacancy-oxygen (VO) center. It is observed that the intensity of the V 2 (=/-) peak is lower compared to that of V 2 (-/0) by a factor of 5. This has been attributed to a highly localized distribution of the defects along the ion tracks, which results in trapping of the carriers at V 2 (-/0) and incomplete occupancy of V 2 (=/-). The SCM measurements obtained in a plan view show a random pattern of regions with a reduced SCM signal for the samples implanted with fluence above 2 x 10 8 cm -2 . The reduced SCM signal is attributed to extra charges associated with acceptor states, such as V 2 (-/0), formed along the ion tracks in the bulk Si. Indeed, the electron emission rate from the V 2 (-/0) state is in the range of 10 kHz at room temperature, which is well below the probing frequency of the SCM measurements, resulting in 'freezing' of electrons at V 2 (-/0)

  6. Application of ion implantation RBS to the study of electrocatalysis

    International Nuclear Information System (INIS)

    Kelly, E.J.; Vallet, C.E.; White, C.W.

    1990-01-01

    Ir-implanted titanium near-surface alloys were prepared by ion implantation, characterized (Ir concentration/depth profiles) by Rutherford backscattering (RBS), and subsequently anodically oxidized to form electrocatalytically active Ir x Ti 1-x O 2 /Ti electrodes. The electrochemical behavior of the metallic-like Ir 4 Ti 1-x O 2 /Ti electrodes in acidic chloride, sulfate, and perchlorate solutions was investigated, and the results compared with those previously obtained with similarly prepared Ru x Ti 1-x O 2 /Ti electrodes. For both electrodes, M x Ti 1-x O 2 /Ti (M equals Ir or Ru), the Tafel slope for the Cl 2 evolution reaction is 40 mV, i.e.,δE/δlog i equals 2.303 (2RT/3F). The reaction order (n) with respect to chloride ion concentration δlogi/δlog[Cl - ] + 1, where K 9 equals 54.9 dm 3 mol -1 for Ir x Ti 1-x O 2 /Ti and K 9 equals 40 dm 3 mol -1 for Ru x Ti 1-x O 2 /Ti. A modified Volmer-Heyrovsky mechanism, one in which the role of absorbed chloride ions is taken into account, is shown to be consistent with aforementioned diagnostic parameters

  7. Nonlinear optical properties of Sn+ ion-implanted silica glass

    International Nuclear Information System (INIS)

    Takeda, Y.; Hioki, T.; Motohiro, T.; Noda, S.; Kurauchi, T.

    1994-01-01

    The absolute value of the third-order nonlinear optical susceptibility, vertical stroke χ (3) vertical stroke , of Sn + ion-implanted silica glass was found to be similar 10 -6 esu. This value is as large as those reported for semiconductor-doped glasses. Silica glass substrates were implanted with Sn + ions at an acceleration energy of 400 keV to a dose of 2x10 17 ions/cm 2 at room temperature. Metallic Sn microcrystallites of 4-20 nm in diameter were found to be embedded in the silica glass matrix. The average volume fraction of the Sn microcrystallites was evaluated to be 28%. vertical stroke χ (3) vertical stroke and the imaginary part of the dielectric function, Im ε, had peaks at the same wavelength of 500 nm owing to surface plasmon resonance. The peak width of vertical stroke χ (3) vertical stroke was nearly half of that of Im ε, which can be explained by an effective medium theory. ((orig.))

  8. The influence of ion implantation on the surface properties of metals and alloys

    International Nuclear Information System (INIS)

    Grant, W.A.; Carter, G.

    1975-10-01

    The report falls into three sections: (1) annealing behaviour of high dose rare gas (Ne, Ar, Kr, Xe) implantations into silicon; (2) measurement of projected and lateral range parameters for low energy heavy ions (Ar, Cu, Kr, Cd, Xe, Cs, Dy, W, Au, Pb, Bi) in silicon by Rutherford backscattering; (3) surface chemistry of ion implanted solids (e.g. corrosion, catalysis, oxidation, synthesis of compounds in ion implanted layers). (U.K.)

  9. Action of age-hardening on the copper single crystals after ion implantation

    International Nuclear Information System (INIS)

    Kul'ment'eva, O.P.; Kul'ment'ev, A.I.

    2007-01-01

    High-dose implantation (up to (1-5)·10 17 cm -2 ) of tantalum ions into a copper single crystal of (100), (110) and (111) orientation has been investigated. Modified properties just after ion implantation and subsequent age-hardening during ten years were studied. It was shown that ion implantation and subsequent masstransfer process results in sufficient long-term stable changes of the microhardness. (authors)

  10. Advanced Cathode for Ultra-High Energy Li-Ion Batteries, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — Advanced lithium-ion (Li-ion) batteries are currently under development for Extravehicular Activity Suits, Altair Lunar Landers, and Lunar Mobility Systems. However,...

  11. Monoenergetic ion beams from ultrathin foils irradiated by ultrahigh-contrast circularly polarized laser pulses

    Directory of Open Access Journals (Sweden)

    O. Klimo

    2008-03-01

    Full Text Available Acceleration of ions from ultrathin foils irradiated by intense circularly polarized laser pulses is investigated using one- and two-dimensional particle simulations. A circularly polarized laser wave heats the electrons much less efficiently than the wave of linear polarization and the ion acceleration process takes place on the front side of the foil. The ballistic evolution of the foil becomes important after all ions contained in the foil have been accelerated. In the ongoing acceleration process, the whole foil is accelerated as a dense compact bunch of quasineutral plasma implying that the energy spectrum of ions is quasimonoenergetic. Because of the ballistic evolution, the velocity spread of an accelerated ion beam is conserved while the average velocity of ions may be further increased. This offers the possibility to control the parameters of the accelerated ion beam. The ion acceleration process is described by the momentum transfer from the laser beam to the foil and it might be fairly efficient in terms of the energy transferred to the heavy ions even if the foil contains a comparable number of light ions or some surface contaminants. Two-dimensional simulations confirm the formation of the quasimonoenergetic spectrum of ions and relatively good collimation of the ion bunch, however the spatial distribution of the laser intensity poses constraints on the maximum velocity of the ion beam. The present ion acceleration mechanism might be suitable for obtaining a dense high energy beam of quasimonoenergetic heavy ions which can be subsequently applied in nuclear physics experiments. Our simulations are complemented by a simple theoretical model which provides the insights on how to control the energy, number, and energy spread of accelerated ions.

  12. Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantation

    Science.gov (United States)

    Zeng, Z. M.; Tian, X. B.; Chu, P. K.

    2003-01-01

    Plasma immersion ion implantation and deposition (PIII-D) offers a non-line-of-sight fabrication method for various types of thin films on steels to improve the surface properties. In this work, titanium films were first deposited on 9Cr18 (AISI440) stainless bearing steel by metal plasma immersion ion implantation and deposition (MePIII-D) using a titanium vacuum arc plasma source. Afterwards, carbon implantation and carbon film deposition were performed by acetylene (C2H2) plasma immersion ion implantation. Multiple-layered structures with superior properties were produced by conducting Ti MePIII-D + C2H2 PIII successively. The composition and structure of the films were investigated employing Auger electron spectroscopy and Raman spectroscopy. It is shown that the mixing for Ti and C atoms is much better when the target bias is higher during Ti MePIII-D. A top diamond-like carbon layer and a titanium oxycarbide layer are formed on the 9Cr18 steel surface. The wear test results indicate that this dual PIII-D method can significantly enhance the wear properties and decrease the surface friction coefficient of 9Cr18 steel.

  13. Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Zeng, Z.M.; Tian, X.B.; Chu, P.K.

    2003-01-01

    Plasma immersion ion implantation and deposition (PIII-D) offers a non-line-of-sight fabrication method for various types of thin films on steels to improve the surface properties. In this work, titanium films were first deposited on 9Cr18 (AISI440) stainless bearing steel by metal plasma immersion ion implantation and deposition (MePIII-D) using a titanium vacuum arc plasma source. Afterwards, carbon implantation and carbon film deposition were performed by acetylene (C 2 H 2 ) plasma immersion ion implantation. Multiple-layered structures with superior properties were produced by conducting Ti MePIII-D + C 2 H 2 PIII successively. The composition and structure of the films were investigated employing Auger electron spectroscopy and Raman spectroscopy. It is shown that the mixing for Ti and C atoms is much better when the target bias is higher during Ti MePIII-D. A top diamond-like carbon layer and a titanium oxycarbide layer are formed on the 9Cr18 steel surface. The wear test results indicate that this dual PIII-D method can significantly enhance the wear properties and decrease the surface friction coefficient of 9Cr18 steel

  14. Productivity Improvement for the SHX--SEN's Single-Wafer High-Current Ion Implanter

    International Nuclear Information System (INIS)

    Ninomiya, Shiro; Ochi, Akihiro; Kimura, Yasuhiko; Yumiyama, Toshio; Kudo, Tetsuya; Kurose, Takeshi; Kariya, Hiroyuki; Tsukihara, Mitsukuni; Ishikawa, Koji; Ueno, Kazuyoshi

    2011-01-01

    Equipment productivity is a critical issue for device fabrication. For ion implantation, productivity is determined both by ion current at the wafer and by utilization efficiency of the ion beam. Such improvements not only result in higher fabrication efficiency but also reduce consumption of both electrical power and process gases. For high-current ion implanters, reduction of implant area is a key factor to increase efficiency. SEN has developed the SAVING system (Scanning Area Variation Implantation with Narrower Geometrical pattern) to address this opportunity. In this paper, three variations of the SAVING system are introduced along with discussion of their effects on fab productivity.

  15. Measurement of Adhesion Strength of DLC Film Prepared by Utilizing Plasma-Based Ion Implantation

    Science.gov (United States)

    Oka, Yoshihiro; Yatsuzuka, Mitsuyasu

    High-adhesion diamond-like carbon (DLC) film was prepared by a hybrid process of plasma-based ion implantation and deposition using superimposed RF and high-voltage pulses. The adhesion strength of DLC film on a stainless steel (SUS304) was enhanced by the carbon ion implantation to the substrate. Furthermore, ion implantation of mixed carbon and silicon led to considerable enhancement of adhesion strength above the resin glue strength. The adhesion strength of DLC film on the aluminum alloy (A-5052) was improved above the resin glue strength only by the carbon ion implantation to the substrate.

  16. Development of EL element by ion implanting into aluminium film

    Energy Technology Data Exchange (ETDEWEB)

    Maeno, Tomokazu; Tanizaki, Yoshiyuki [Tokyo Metropolitan Industrial Technology Research Inst. (Japan); Morisaki; Shigeki

    1999-01-01

    Rare earth elements were added to a barrier type anodized aluminium film by an ion implantation method, and then the film was reoxidized with direct current. EL characteristic properties by adding elements were observed by reoxidation. Red, blue and green were shown by adding Eu, Tm and Tb, respectively. The EL characteristics of barrier type film were affected by the surface pretreatment. The film treated with degreasing showed that the EL intensity increased much more from lower reanodizing voltage than that of film treated with electropolishing. The film with some elements showed each peculiar color without interference. So that we can see the mixed colors of them. (S.Y.)

  17. Simulation and visualization of ion-implantation in diamond

    International Nuclear Information System (INIS)

    Adler, Joan; Silverman, Amihai; Ierushalmi, Niv; Sorkin, Anastassia; Kalish, Rafi

    2014-01-01

    We have explored aspects of ion implantation in diamonds with molecular dynamics and tightbinding atomistic simulations. Relevant experiments and their potential applications as well as our computer models and computational approaches are described. Our simulations have been designed to answer questions proposed by experimental researchers concerning optimal laboratory schedules for the preparation of samples with potential applications to diamond membranes and NV centers for quantum computers. Simulation and visualization of results enable us to peek inside samples where experimental techniques cannot tread. In order to provide the requisite Brazilian component a new connection between these models and bootstrap percolation is made

  18. Surface modification of titanium and titanium alloys by ion implantation.

    Science.gov (United States)

    Rautray, Tapash R; Narayanan, R; Kwon, Tae-Yub; Kim, Kyo-Han

    2010-05-01

    Titanium and titanium alloys are widely used in biomedical devices and components, especially as hard tissue replacements as well as in cardiac and cardiovascular applications, because of their desirable properties, such as relatively low modulus, good fatigue strength, formability, machinability, corrosion resistance, and biocompatibility. However, titanium and its alloys cannot meet all of the clinical requirements. Therefore, to improve the biological, chemical, and mechanical properties, surface modification is often performed. In view of this, the current review casts new light on surface modification of titanium and titanium alloys by ion beam implantation. (c) 2010 Wiley Periodicals, Inc.

  19. Raman scattering in silicon disordered by gold ion implantation

    Czech Academy of Sciences Publication Activity Database

    Lavrentiev, Vasyl; Vacík, Jiří; Vorlíček, Vladimír; Voseček, Václav

    2010-01-01

    Roč. 247, č. 8 (2010), s. 2022-2026 ISSN 0370-1972. [8th International Conference on Optics of Surfaces and Interfaces (OSI-VIII). Ischia, 07.09.2009-11.09.2009] R&D Projects: GA AV ČR IAA200480702; GA AV ČR IAA400100701; GA AV ČR(CZ) KAN400480701; GA ČR GA106/09/1264 Institutional research plan: CEZ:AV0Z10480505; CEZ:AV0Z10100520 Keywords : ion implantation * Raman spectra * Rutherford backscattering spectroscopy Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.344, year: 2010

  20. Production of solid deuterium targets by ion implantation

    International Nuclear Information System (INIS)

    Csikai, J.; Szegedi, S.; Olah, L.; El-Megrab, A.M.; Molla, N.I.; Rahman, M.M.; Miah, R.U.; Habbani, F.; Shaddad, I.

    1997-01-01

    Solid metal, semiconductor and metallic glass samples were irradiated with deuteron atomic ions between 60 and 180 keV incident energies. Accumulation rates of deuterons in different targets were recorded by the detection of protons and neutrons via the 2 H(d,p) and 2 H(d,n) reactions. A simple analytical expression is given to describe the kinetics of the accumulation. The dependence of the reaction rate on the deuteron energy gives information on the concentration profile in addition to the neutron flux density spectra. A varying distortion of the implanted deuteron profiles by a change in the beam energy were also observed for different targets. (orig.)

  1. Titanium and aluminium ions implanted by plasma on polyethylene

    International Nuclear Information System (INIS)

    Cruz, G.J.; Olayo, M.G.; Lopez, R.; Granda, E.; Munoz, A.; Valencia, R.; Morales, J.

    2007-01-01

    The ion implantation by plasma of titanium and aluminum on polyethylene thin films (PE) is presented. The results indicate that the polymers reacted firstly with the oxygen and/or nitrogen carrying gases, and later its received the metallic particles that formed thin films. The stainless steel and the titanium formed a single phase. The metallic layers grew in the interval of 1 to 2 nm/min, its are thin, but enough to change the hardness of the polymer that it is increased in more of 20 times. (Author)

  2. Amorphization and recrystallization in MeV ion implanted InP crystals

    International Nuclear Information System (INIS)

    Xiong, F.; Nieh, C.W.; Jamieson, D.N.; Vreeland, T. Jr.; Tombrello, T.A.

    1988-01-01

    A comprehensive study of MeV- 15 N-ion-implanted InP by a variety of analytical techniques has revealed the physical processes involved in MeV ion implantation into III-V compound semiconductors as well as the influence of post-implantation annealing. It provides a coherent picture of implant distribution, structural transition, crystalline damage, and lattice strain in InP crystals induced by ion implantation and thermal annealing. The experimental results from the different measurements are summarized in this report. Mechanisms of amorphization by implantation and recrystallization through annealing in MeV-ion-implanted InP are proposed and discussed in light of the results obtained

  3. The effect of ion implantation on the fatigue properties of polycrystalline copper

    International Nuclear Information System (INIS)

    Kujore, A.; Chakrabortty, S.B.; Starke, E.A. Jr.; Legg, K.O.

    1981-01-01

    The effect of ion implantation (aluminium, boron or chromium) on the tensile and strain or stress controlled fatigue behavior of polycrystalline copper has been studied. The monotonic and cyclic stress-strain relationships, cyclic strain-life and stress-life relationships, cyclic deformation characteristics and crack nucleation behavior of implanted copper are compared with unimplanted copper. Monotonic and cyclic flow stresses are reduced by ion implantation. Life under strain controlled fatigue is improved by ion implantation. Aluminium implantation has the greatest effect on both flow-stress reduction and life improvement. Life under stress controlled fatigue may or may not be improved by implantation. Aluminium and chromium implantation produces a significant improvement whereas boron implantation causes a reduction in the resistance to stress-cycling. (orig.)

  4. Nanoscale investigation of enhanced electron field emission for silver ion implanted/post-annealed ultrananocrystalline diamond films.

    Science.gov (United States)

    Panda, Kalpataru; Hyeok, Jeong Jin; Park, Jeong Young; Sankaran, Kamatchi Jothiramalingam; Balakrishnan, Sundaravel; Lin, I-Nan

    2017-11-24

    Silver (Ag) ions are implanted in ultrananocrystalline diamond (UNCD) films to enhance the electron field emission (EFE) properties, resulting in low turn-on field of 8.5 V/μm with high EFE current density of 6.2 mA/cm 2 (at an applied field of 20.5 V/μm). Detailed nanoscale investigation by atomic force microscopy based peak force-controlled tunneling atomic force microscopy (PF-TUNA) and ultra-high vacuum scanning tunneling microscopy (STM) based current imaging tunneling spectroscopy (CITS) reveal that the UNCD grain boundaries are the preferred electron emission sites. The two scanning probe microscopic results supplement each other well. However, the PF-TUNA measurement is found to be better for explaining the local electron emission behavior than the STM-based CITS technique. The formation of Ag nanoparticles induced abundant sp 2 nanographitic phases along the grain boundaries facilitate the easy transport of electrons and is believed to be a prime factor in enhancing the conductivity/EFE properties of UNCD films. The nanoscale understanding on the origin of electron emission sites in Ag-ion implanted/annealed UNCD films using the scanning probe microscopic techniques will certainly help in developing high-brightness electron sources for flat-panel displays applications.

  5. Surface potential measurement of negative-ion-implanted insulators by analysing secondary electron energy distribution

    International Nuclear Information System (INIS)

    Toyota, Yoshitaka; Tsuji, Hiroshi; Nagumo, Syoji; Gotoh, Yasuhito; Ishikawa, Junzo; Sakai, Shigeki.

    1994-01-01

    The negative ion implantation method we have proposed is a noble technique which can reduce surface charging of isolated electrodes by a large margin. In this paper, the way to specify the surface potential of negative-ion-implanted insulators by the secondary electron energy analysis is described. The secondary electron energy distribution is obtained by a retarding field type energy analyzer. The result shows that the surface potential of fused quartz by negative-ion implantation (C - with the energy of 10 keV to 40 keV) is negatively charged by only several volts. This surface potential is extremely low compared with that by positive-ion implantation. Therefore, the negative-ion implantation is a very effective method for charge-up free implantation without charge compensation. (author)

  6. Application of nitrogen plasma immersion ion implantation to titanium nasal implants with nanonetwork surface structure

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Ying-Sui; Yang, Wei-En [Department of Dentistry, National Yang-Ming University, Taipei 112, Taiwan (China); Zhang, Lan [State Key Laboratory for Mechanical Behavior of Materials, Xi' an Jiaotong University, Xi' an 710049 (China); Zhu, Hongqin [State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050 (China); Lan, Ming-Ying [Division of Rhinology, Department of Otolaryngology Head and Neck Surgery, Taipei Veterans General Hospital, Taipei 112, Taiwan and School of Medicine, National Yang-Ming University, Taipei 112, Taiwan (China); Lee, Sheng-Wei [Institute of Materials Science and Engineering, National Central University, Taoyuan 320, Taiwan (China); Huang, Her-Hsiung, E-mail: hhhuang@ym.edu.tw [Department of Dentistry, National Yang-Ming University, Taipei 112, Taiwan (China); Institute of Oral Biology, National Yang-Ming University, Taipei 112, Taiwan (China); Graduate Institute of Basic Medical Science, China Medical University, Taichung 404, Taiwan (China); Department of Medical Research, China Medical University Hospital, Taichung 407, Taiwan (China); Department of Bioinformatics and Medical Engineering, Asia University, Taichung 413, Taiwan (China); Department of Stomatology, Taipei Veterans General Hospital, Taipei 112, Taiwan (China)

    2016-07-15

    In nasal reconstruction, the response of cells to titanium (Ti) implants is mainly determined by surface features of the implant. In a pilot study, the authors applied electrochemical anodization to Ti surfaces in an alkaline solution to create a network of nanoscale surface structures. This nanonetwork was intended to enhance the responses of primary human nasal epithelial cell (HNEpC) to the Ti surface. In this study, the authors then treated the anodized, nanonetwork-structured Ti surface using nitrogen plasma immersion ion implantation (NPIII) in order to further improve the HNEpC response to the Ti surface. Subsequently, surface characterization was performed to elucidate morphology, roughness, wettability, and chemistry of specimens. Cytotoxicity, blood, and HNEpC responses were also evaluated. Our results demonstrate that NPIII treatment led to the formation of a noncytotoxic TiN-containing thin film (thickness <100 nm) on the electrochemically anodized Ti surface with a nanonetwork-structure. NPIII treatment was shown to improve blood clotting and the adhesion of platelets to the anodized Ti surface as well as the adhesion and proliferation of hNEpC. This research spreads our understanding of the fact that a TiN-containing thin film, produced using NPIII treatment, could be used to improve blood and HNEpC responses to anodized, nanonetwork-structured Ti surfaces in nasal implant applications.

  7. Development of a simple, low cost, indirect ion beam fluence measurement system for ion implanters, accelerators

    Science.gov (United States)

    Suresh, K.; Balaji, S.; Saravanan, K.; Navas, J.; David, C.; Panigrahi, B. K.

    2018-02-01

    We developed a simple, low cost user-friendly automated indirect ion beam fluence measurement system for ion irradiation and analysis experiments requiring indirect beam fluence measurements unperturbed by sample conditions like low temperature, high temperature, sample biasing as well as in regular ion implantation experiments in the ion implanters and electrostatic accelerators with continuous beam. The system, which uses simple, low cost, off-the-shelf components/systems and two distinct layers of in-house built softwarenot only eliminates the need for costly data acquisition systems but also overcomes difficulties in using properietry software. The hardware of the system is centered around a personal computer, a PIC16F887 based embedded system, a Faraday cup drive cum monitor circuit, a pair of Faraday Cups and a beam current integrator and the in-house developed software include C based microcontroller firmware and LABVIEW based virtual instrument automation software. The automatic fluence measurement involves two important phases, a current sampling phase lasting over 20-30 seconds during which the ion beam current is continuously measured by intercepting the ion beam and the averaged beam current value is computed. A subsequent charge computation phase lasting 700-900 seconds is executed making the ion beam to irradiate the samples and the incremental fluence received by the sampleis estimated usingthe latest averaged beam current value from the ion beam current sampling phase. The cycle of current sampling-charge computation is repeated till the required fluence is reached. Besides simplicity and cost-effectiveness, other important advantages of the developed system include easy reconfiguration of the system to suit customisation of experiments, scalability, easy debug and maintenance of the hardware/software, ability to work as a standalone system. The system was tested with different set of samples and ion fluences and the results were verified using

  8. Modification of magnetic properties of polyethyleneterephthalate by iron ion implantation

    International Nuclear Information System (INIS)

    Lukashevich, M.G.; Batlle, X.; Labarta, A.; Popok, V.N.; Zhikharev, V.A.; Khaibullin, R.I.; Odzhaev, V.B.

    2007-01-01

    Fe + ions (40 keV) were implanted into polyethyleneterephthalate (PET) films with fluences of (0.25-1.5) x 10 17 cm -2 . Magnetic properties of the synthesised Fe:PET composites were studied using superconducting quantum interference device (SQUID) technique in temperature range of 2-300 K. For range of fluences (0.5-0.75) x 10 17 cm -2 the samples reveal superparamagnetic behaviour at room temperature. At fluences above 0.75 x 10 17 cm -2 the strong increase of magnetisation and transition to ferromagnetic properties are registered. Analysis of the magnetic hysteresis loops suggests an easy plane magnetic anisotropy similar to that found for thin magnetic films. Zero-field-cooled (ZFC) and field-cooled (FC) temperature measurements of magnetisation are found to be in agreement with earlier observed formation of Fe nanoparticles (NPs) in the implanted layers. The growth and agglomeration of the NPs forming the quasi-continuous labyrinth-like structure in the polymer film at the highest implantation fluence of 1.5 x 10 17 cm -2 is an origin for the transition to the ferromagnetic properties

  9. Peripheral nerve regeneration through a silicone chamber implanted with negative carbon ions: Possibility to clinical application

    Science.gov (United States)

    Ikeguchi, Ryosuke; Kakinoki, Ryosuke; Tsuji, Hiroshi; Yasuda, Tadashi; Matsuda, Shuichi

    2014-08-01

    We investigated whether a tube with its inner surface implanted with negative-charged carbon ions (C- ions) would enable axons to extend over a distance greater than 10 mm. The tube was found to support nerves regenerating across a 15-mm-long inter-stump gap. We also investigated whether a C- ion-implanted tube pretreated with basic fibroblast growth factor (bFGF) promotes peripheral nerve regeneration. The C- ion implanted tube accelerated nerve regeneration, and this effect was enhanced by bFGF. Silicone treated with C- ions showed increased hydrophilic properties and cellular affinity, and axon regeneration was promoted with this increased biocompatibility.

  10. Heavy ion time-of-flight ERDA of high dose metal implanted germanium

    Energy Technology Data Exchange (ETDEWEB)

    Dytlewski, N.; Evans, P.J.; Noorman, J.T. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia); Wielunski, L.S. [Commonwealth Scientific and Industrial Research Organisation (CSIRO), Lindfield, NSW (Australia). Div. of Applied Physics; Bunder, J. [New South Wales Univ., Wollongong, NSW (Australia). Wollongong Univ. Coll

    1996-12-31

    With the thick Ge substrates used in ion implantation, RBS can have difficulty in resolving the mass-depth ambiguities when analysing materials composed of mixtures of elements with nearly equal masses. Additional, and complimentary techniques are thus required. This paper reports the use of heavy ion time-of-flight elastic recoil detection analysis (ToF- ERDA), and conventional RBS in the analysis of Ge(100) implanted with high dose Ti and Cu ions from a MEWA ion source . Heavy ion ToF ERDA has been used to resolve, and profile the implanted transition metal species, and also to study any oxygen incorporation into the sample resulting from the implantation, or subsequential reactions with air or moisture. This work is part of a study on high dose metal ion implantation of medium atomic weight semiconductor materials. 13 refs., 6 figs.

  11. Platelet adhesion and plasma protein adsorption control of collagen surfaces by He+ ion implantation

    International Nuclear Information System (INIS)

    Kurotobi, K.; Suzuki, Y.; Nakajima, H.; Suzuki, H.; Iwaki, M.

    2003-01-01

    He + ion implanted collagen-coated tubes with a fluence of 1 x 10 14 ions/cm 2 were exhibited antithrombogenicity. To investigate the mechanisms of antithrombogenicity of these samples, plasma protein adsorption assay and platelet adhesion experiments were performed. The adsorption of fibrinogen (Fg) and von Willebrand factor (vWf) was minimum on the He + ion implanted collagen with a fluence of 1 x 10 14 ions/cm 2 . Platelet adhesion (using platelet rich plasma) was inhibited on the He + ion implanted collagen with a fluence of 1 x 10 14 ions/cm 2 and was accelerated on the untreated collagen and ion implanted collagen with fluences of 1 x 10 13 , 1 x 10 15 and 1 x 10 16 ions/cm 2 . Platelet activation with washed platelets was observed on untreated collagen and He + ion implanted collagen with a fluence of 1 x 10 14 ions/cm 2 and was inhibited with fluences of 1 x 10 13 , 1 x 10 15 and 1 x 10 16 ions/cm 2 . Generally, platelets can react with a specific ligand inside the collagen (GFOGER sequence). The results of platelets adhesion experiments using washed platelets indicated that there were no ligands such as GFOGER on the He + ion implanted collagen over a fluence of 1 x 10 13 ions/cm 2 . On the 1 x 10 14 ions/cm 2 implanted collagen, no platelet activation was observed due to the influence of plasma proteins. >From the above, it is concluded that the decrease of adsorbed Fg and vWf caused the antithrombogenicity of He + ion implanted collagen with a fluence of 1 x 10 14 ions/cm 2 and that plasma protein adsorption took an important role repairing the graft surface

  12. Industrial plasma immersion ion implanter and its applications

    CERN Document Server

    Tong Hong Hui; Huo Yan Feng; Wang Ke; Mu Li Lan; Feng Tie Min; Zhao Jun; Yan Bing; Geng Man

    2002-01-01

    A new generation industrial plasma immersion ion implanter was developed recently in South-western Institute of Physics and some experimental results are reported. The vacuum chamber with 900 mm in diameter and 1050 mm in height stands vertically. The pumping system includes turbo -pump and mechanical pump and it can be automatically controlled by PLC. The background pressure is less than 4 x 10 sup - sup 4 Pa. The plasma in the chamber can be generated by hot-filament discharge and three high-efficiency magnetic filter metal plasma sources, so that the plasma immersion ion implantation and enhanced deposition can be done. The maximum pulse voltage output is 80 kV, maximum pulse current is 60 A, repetition frequency is 50-500 Hz, and the pulse rise time is less than 2 mu s. The power modulator can operate in the pulse bunching mode if necessary. In general, the plasma density is 10 sup 8 -10 sup 1 sup 0 cm sup - sup 3 , the film deposition rate is 0.1-0.5 nm/s

  13. Comprehensive modeling of ion-implant amorphization in silicon

    International Nuclear Information System (INIS)

    Mok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P.; Benistant, F.

    2005-01-01

    A physically based model has been developed to simulate the ion-implant induced damage accumulation up to amorphization in silicon. Based on damage structures known as amorphous pockets (AP), which are three-dimensional, irregularly shaped agglomerates of interstitials (I) and vacancies (V) surrounded by crystalline silicon, the model is able to reproduce a wide range of experimental observations of damage accumulation and amorphization with interdependent implantation parameters. Instead of recrystallizing the I's and V's instantaneously, the recrystallization rate of an AP containing nI and mV is a function of its effective size, defined as min(n, m), irrespective of its internal spatial configuration. The parameters used in the model were calibrated using the experimental silicon amorphous-crystalline transition temperature as a function of dose rate for C, Si, and Ge. The model is able to show the superlinear damage build-up with dose, the extent of amorphous layer and the superadditivity effect of polyatomic ions

  14. Ion-implantation and analysis for doped silicon slot waveguides

    Directory of Open Access Journals (Sweden)

    McCallum J. C.

    2012-10-01

    Full Text Available We have utilised ion implantation to fabricate silicon nanocrystal sensitised erbium-doped slot waveguide structures in a Si/SiO2/Si layered configuration and photoluminescence (PL and Rutherford backscattering spectrometry (RBS to analyse these structures. Slot waveguide structures in which light is confined to a nanometre-scale low-index region between two high-index regions potentially offer significant advantages for realisation of electrically-pumped Si devices with optical gain and possibly quantum optical devices. We are currently investigating an alternative pathway in which high quality thermal oxides are grown on silicon and ion implantation is used to introduce the Er and Si-ncs into the SiO2 layer. This approach provides considerable control over the Er and Si-nc concentrations and depth profiles which is important for exploring the available parameter space and developing optimised structures. RBS is well-suited to compositional analysis of these layered structures. To improve the depth sensitivity we have used a 1 MeV α beam and results indicate that a layered silicon-Er:SiO2/silicon structure has been fabricated as desired. In this paper structural results will be compared to Er photoluminescence profiles for samples processed under a range of conditions.

  15. Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation

    Science.gov (United States)

    Shamim, M. M.; Scheuer, J. T.; Fetherston, R. P.; Conrad, J. R.

    1991-11-01

    An experimental procedure has been developed to measure electron emission due to energetic ion bombardment during plasma source ion implantation. Spherical targets of copper, stainless steel, graphite, titanium alloy, and aluminum alloy were biased negatively to 20, 30, and 40 kV in argon and nitrogen plasmas. A Langmuir probe was used to detect the propagating sheath edge and a Rogowski transformer was used to measure the current to the target. The measurements of electron emission coefficients compare well with those measured under similar conditions.

  16. Stoichiometric carbon nitride synthesized by ion beam sputtering and post nitrogen ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Valizadeh, R.; Colligon, J.S. [Salford Univ. (United Kingdom). DMM Institute; Katardiev, I.V. [Uppsala Univ. (Sweden). Angstrom Laboratory; Faunce, C.A.; Donnelly, S.E. [Salford Univ. (United Kingdom). Science Institute

    1998-06-01

    Full text: Carbon nitride films have been deposited on Si (100) by ion beam sputtering a vitreous graphite target with nitrogen and argon ions with and without concurrent N2 ion bombardment at room temperature. The sputtering beam energy was 1000 eV and the assisted beam energy was 300 eV with ion / atom arrival ratio ranging from 0.5 to 5. The carbon nitride films were deposited both as single layer directly on silicon substrate and as multilayer between two layers of stoichiometric amorphous silicon nitride and polycrystalline titanium nitride. The deposited films were implanted ex-situ with 30 keV nitrogen ions with various doses ranging from 1E17 to 4E17 ions.cm{sup -2} and 2 GeV xenon ion with a dose of 1E12 ions.cm{sup -2} . The nitrogen concentration of the films was measured with Rutherford Backscattering (RBS), Secondary Neutral Mass Spectrometry (SNMS) and Parallel Electron Energy Loss Spectroscopy (PEELS). The nitrogen concentration for as deposited sample was 34 at% and stoichiometric carbon nitride C{sub 3}N{sub 4} was achieved by post nitrogen implantation of the multi-layered films. Post bombardment of single layer carbon nitride films lead to reduction in the total nitrogen concentration. Carbon K edge structure obtained from PEELS analysis suggested that the amorphous C{sub 3}N{sub 4} matrix was predominantly sp{sup 2} bonded. This was confirmed by Fourier Transforrn Infra-Red Spectroscopy (FTIR) analysis of the single CN layer which showed the nitrogen was mostly bonded with carbon in nitrile (C{identical_to}N) and imine (C=N) groups. The microstructure of the film was determined by Transmission Electron Microscopy (TEM) which indicated that the films were amorphous.

  17. Single ion impact detection and scanning probe aligned ion implantation for quantum bit formation

    International Nuclear Information System (INIS)

    Weis, Christoph D.

    2011-01-01

    Quantum computing and quantum information processing is a promising path to replace classical information processing via conventional computers which are approaching fundamental physical limits. Instead of classical bits, quantum bits (qubits) are utilized for computing operations. Due to quantum mechanical phenomena such as superposition and entanglement, a completely different way of information processing is achieved, enabling enhanced performance for certain problem sets. Various proposals exist on how to realize a quantum bit. Among them are electron or nuclear spins of defect centers in solid state systems. Two such candidates with spin degree of freedom are single donor atoms in silicon and nitrogen vacancy (NV) defect centers in diamond. Both qubit candidates possess extraordinary qualities which makes them promising building blocks. Besides certain advantages, the qubits share the necessity to be placed precisely in their host materials and device structures. A commonly used method is to introduce the donor atoms into the substrate materials via ion implantation. For this, focused ion beam systems can be used, or collimation techniques as in this work. A broad ion beam hits the back of a scanning probe microscope (SPM) cantilever with incorporated apertures. The high resolution imaging capabilities of the SPM allows the non destructive location of device areas and the alignment of the cantilever and thus collimated ion beam spot to the desired implant locations. In this work, this technique is explored, applied and pushed forward to meet necessary precision requirements. The alignment of the ion beam to surface features, which are sensitive to ion impacts and thus act as detectors, is demonstrated. The technique is also used to create NV center arrays in diamond substrates. Further, single ion impacts into silicon device structures are detected which enables deliberate single ion doping.

  18. Single ion impact detection and scanning probe aligned ion implantation for quantum bit formation

    Energy Technology Data Exchange (ETDEWEB)

    Weis, Christoph D.

    2011-10-04

    Quantum computing and quantum information processing is a promising path to replace classical information processing via conventional computers which are approaching fundamental physical limits. Instead of classical bits, quantum bits (qubits) are utilized for computing operations. Due to quantum mechanical phenomena such as superposition and entanglement, a completely different way of information processing is achieved, enabling enhanced performance for certain problem sets. Various proposals exist on how to realize a quantum bit. Among them are electron or nuclear spins of defect centers in solid state systems. Two such candidates with spin degree of freedom are single donor atoms in silicon and nitrogen vacancy (NV) defect centers in diamond. Both qubit candidates possess extraordinary qualities which makes them promising building blocks. Besides certain advantages, the qubits share the necessity to be placed precisely in their host materials and device structures. A commonly used method is to introduce the donor atoms into the substrate materials via ion implantation. For this, focused ion beam systems can be used, or collimation techniques as in this work. A broad ion beam hits the back of a scanning probe microscope (SPM) cantilever with incorporated apertures. The high resolution imaging capabilities of the SPM allows the non destructive location of device areas and the alignment of the cantilever and thus collimated ion beam spot to the desired implant locations. In this work, this technique is explored, applied and pushed forward to meet necessary precision requirements. The alignment of the ion beam to surface features, which are sensitive to ion impacts and thus act as detectors, is demonstrated. The technique is also used to create NV center arrays in diamond substrates. Further, single ion impacts into silicon device structures are detected which enables deliberate single ion doping.

  19. Mg ion implantation on SLA-treated titanium surface and its effects on the behavior of mesenchymal stem cell

    International Nuclear Information System (INIS)

    Kim, Beom-Su; Kim, Jin Seong; Park, Young Min; Choi, Bo-Young; Lee, Jun

    2013-01-01

    Magnesium (Mg) is one of the most important ions associated with bone osseointegration. The aim of this study was to evaluate the cellular effects of Mg implantation in titanium (Ti) surfaces treated with sand blast using large grit and acid etching (SLA). Mg ions were implanted into the surface via vacuum arc source ion implantation. The surface morphology, chemical properties, and the amount of Mg ion release were evaluated by scanning electron microscopy (SEM), Auger electron spectroscopy (AES), Rutherford backscattering spectroscopy (RBS), and inductively coupled plasma-optical emission spectrometer (ICP-OES). Human mesenchymal stem cells (hMSCs) were used to evaluate cellular parameters such as proliferation, cytotoxicity, and adhesion morphology by MTS assay, live/dead assay, and SEM. Furthermore, osteoblast differentiation was determined on the basis of alkaline phosphatase (ALP) activity and the degree of calcium accumulation. In the Mg ion-implanted disk, 2.3 × 10 16 ions/cm 2 was retained. However, after Mg ion implantation, the surface morphology did not change. Implanted Mg ions were rapidly released during the first 7 days in vitro. The MTS assay, live/dead assay, and SEM demonstrated increased cell attachment and growth on the Mg ion-implanted surface. In particular, Mg ion implantation increased the initial cell adhesion, and in an osteoblast differentiation assay, ALP activity and calcium accumulation. These findings suggest that Mg ion implantation using the plasma source ion implantation (PSII) technique may be useful for SLA-treated Ti dental implants to improve their osseointegration capacity. - Highlights: ► Mg ion was coated onto surface of SLA treated titanium via vacuum arc source ion implantation method. ► The morphological characteristics did not change after Mg ion implantation. ► Mg ion implanted SLA Ti is highly cytocompatible. ► Initial cell adhesion of MSCs is improved by Mg ion implantation. ► Mg ion implantation improved

  20. Mg ion implantation on SLA-treated titanium surface and its effects on the behavior of mesenchymal stem cell

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Beom-Su; Kim, Jin Seong [Wonkwang Bone Regeneration Research Institute, Wonkwang University, Iksan 570-749 (Korea, Republic of); Bonecell Biotech Inc., 77, Dunsan-ro, Seo-gu, Daejeon 302-830 (Korea, Republic of); Park, Young Min [DIO Corporation, 66, Centum seo-ro, Haeundae-gu, Busan (Korea, Republic of); Choi, Bo-Young [Department of Oral and maxillofacial Surgery, Wonkwang University Daejeon Dental Hospital, Daejeon 302-830 (Korea, Republic of); Lee, Jun, E-mail: omslee@wku.ac.kr [Wonkwang Bone Regeneration Research Institute, Wonkwang University, Iksan 570-749 (Korea, Republic of); Bonecell Biotech Inc., 77, Dunsan-ro, Seo-gu, Daejeon 302-830 (Korea, Republic of)

    2013-04-01

    Magnesium (Mg) is one of the most important ions associated with bone osseointegration. The aim of this study was to evaluate the cellular effects of Mg implantation in titanium (Ti) surfaces treated with sand blast using large grit and acid etching (SLA). Mg ions were implanted into the surface via vacuum arc source ion implantation. The surface morphology, chemical properties, and the amount of Mg ion release were evaluated by scanning electron microscopy (SEM), Auger electron spectroscopy (AES), Rutherford backscattering spectroscopy (RBS), and inductively coupled plasma-optical emission spectrometer (ICP-OES). Human mesenchymal stem cells (hMSCs) were used to evaluate cellular parameters such as proliferation, cytotoxicity, and adhesion morphology by MTS assay, live/dead assay, and SEM. Furthermore, osteoblast differentiation was determined on the basis of alkaline phosphatase (ALP) activity and the degree of calcium accumulation. In the Mg ion-implanted disk, 2.3 × 10{sup 16} ions/cm{sup 2} was retained. However, after Mg ion implantation, the surface morphology did not change. Implanted Mg ions were rapidly released during the first 7 days in vitro. The MTS assay, live/dead assay, and SEM demonstrated increased cell attachment and growth on the Mg ion-implanted surface. In particular, Mg ion implantation increased the initial cell adhesion, and in an osteoblast differentiation assay, ALP activity and calcium accumulation. These findings suggest that Mg ion implantation using the plasma source ion implantation (PSII) technique may be useful for SLA-treated Ti dental implants to improve their osseointegration capacity. - Highlights: ► Mg ion was coated onto surface of SLA treated titanium via vacuum arc source ion implantation method. ► The morphological characteristics did not change after Mg ion implantation. ► Mg ion implanted SLA Ti is highly cytocompatible. ► Initial cell adhesion of MSCs is improved by Mg ion implantation. ► Mg ion implantation

  1. Effect of disorder and defects in ion-implanted semiconductors electrical and physiochemical characterization

    CERN Document Server

    Willardson, Robert K; Christofides, Constantinos; Ghibaudo, Gerard

    2014-01-01

    Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing.Electrical and Physicochemical Characterization focuses on the physics of the annealing kine

  2. The influence of incidence angle on disorder production in Cl and Ar ion implanted Si

    International Nuclear Information System (INIS)

    Sukirno; Carter, G.

    1989-01-01

    Cl and Ar ions have been implanted, at 30 keV and at various incidence angles, into Si substrates maintained at room temperature during implantation. Implantation induced Si disorder was measured using Rutherford backscattering channelling. The effects upon disorder of various incidence angles were studied over a fluence range of 10 12 -6·10 15 ions·cm -2 . The results show that, at low fluences Cl and Ar ion implantations generate a bimodal disorder-depth profile, whilst at higher fluences measurements of amorphised layer thickness as a function of ion incidence angle allow values of the standard deviation of the disorder profile parallel and transverse to the ion beam direction for each ion to be obtained in good agreement with theoretical predictions. The disorder-fluence behaviour under these conditions is ion species independent. (author)

  3. Wear of nitrogen ion implanted copper with tribological Cu-Mo-S coatings

    Science.gov (United States)

    Zharkov, Stanislav Yu.; Sergeev, Victor P.; Sungatulin, Alfred R.; Kalashnikov, Mark P.

    2017-12-01

    The paper studies the effect of nitrogen ion implantation in copper samples before depositing a solid lubricant Cu-Mo-S coating on their wear resistance during wear testing in pairs with a copper counterface in the argon atmosphere. It was found that wear resistance of samples with Cu-Mo-S coating decreased with the increase in fluence of nitrogen ion implantation.

  4. Multi-dimensional microanalysis of masklessly implanted atoms using focused heavy ion beam

    International Nuclear Information System (INIS)

    Mokuno, Yoshiaki; Iiorino, Yuji; Chayahara, Akiyoshi; Kiuchi, Masato; Fujii, Kanenaga; Satou, Mamoru

    1992-01-01

    Multi-dimensional structure fabricated by maskless MeV gold implantation in silicon wafer was analyzed by 3 MeV carbon ion microprobe using a microbeam line developed at GIRIO. The minimum line width of the implanted region was estimated to be about 5 μm. The advantages of heavy ions for microanalysis were demonstrated. (author)

  5. The third generation multi-purpose plasma immersion ion implanter for surface modification of materials

    CERN Document Server

    Tang Bao Yin; Wang Xiao Feng; Gan Kong Yin; Wang Song Yan; Chu, P K; Huang Nian Ning; Sun Hong

    2002-01-01

    The third generation multi-purpose plasma immersion ion implantation (PIII) equipment has been successfully used for research and development of surface modification of biomedical materials, metals and their alloys in the Southwest Jiaotong University. The implanter equipped with intense current, pulsed cathodic arc metal plasma sources which have both strong coating function and gas and metal ion implantation function. Its pulse high voltage power supply can provide big output current. It can acquire very good implantation dose uniformity. The equipment can both perform ion implantation and combine ion implantation with sputtering deposition and coating to form many kinds of synthetic surface modification techniques. The main design principles, features of important components and achievement of research works in recent time have been described

  6. Effects on cuytoskeleton system in pollen tube of pinus thunbergii induced by ion beam implantation

    International Nuclear Information System (INIS)

    Huang Qunce; Liang Qiuxia; Li Guopin

    2008-01-01

    The damage of the cytoskeleton system in the pollen and the pollen tube of Pinus thunbergii induced by ion beam implantation were researched. The results showed that the disorganization of the micro-tubules in the pollen tube was produced by N + implantation. The abnormal states of the pollen tube in morphology were very correlative with the abnormality of the cytoskeleton system. N + implantation was responsible for morphological abnormalities in the pollen tubes. There was a distinct correlation between the damage effects and the ion implantation dose. The add of dose caused more obvious damage effects. Furthermore, the state of the cytoskeleton system in the pollen tube was influenced by the ion implantation. The impact grade depended also on the ion implantation dose. (authors)

  7. Ion implantation in compound semiconductors for high-performance electronic devices

    International Nuclear Information System (INIS)

    Zolper, J.C.; Baca, A.G.; Sherwin, M.E.; Klem, J.F.

    1996-01-01

    Advanced electronic devices based on compound semiconductors often make use of selective area ion implantation doping or isolation. The implantation processing becomes more complex as the device dimensions are reduced and more complex material systems are employed. The authors review several applications of ion implantation to high performance junction field effect transistors (JFETs) and heterostructure field effect transistors (HFETs) that are based on compound semiconductors, including: GaAs, AlGaAs, InGaP, and AlGaSb

  8. Ion implantation reinforcement of the protective efficiency of nickel in artificial sea-water

    CERN Document Server

    Leroy, L; Grosseau-Poussard, J L; Dinhut, J F

    2002-01-01

    Ni bulk specimens have been implanted with Cr, Cu and Ar ions (4x10 sup 1 sup 6 ions/cm sup 2 , 60 keV) in order to distinguish between chemical and radiation damage effects on protection corrosion. The corrosion behaviour in artificial sea-water of ion-implanted and pure Ni has been studied at room temperature by electrochemical impedance spectroscopy (EIS) technique. EIS spectra of ion-implanted Ni exhibit one capacitance loop while in pure Ni two distinct loops are observed. Moreover an important increase in the polarisation resistance is noticed for all implanted ions. Theses changes in EIS behaviour with implantation is related to the increase of the superficial layer density resulting in a decrease of heterogeneity of the passive layer. Equivalent circuits are proposed to fit the impedance spectra and corresponding electrochemical parameters are deduced.

  9. Ion implantation reinforcement of the protective efficiency of nickel in artificial sea-water

    International Nuclear Information System (INIS)

    Leroy, L.; Girault, P.; Grosseau-Poussard, J.L.; Dinhut, J.F.

    2002-01-01

    Ni bulk specimens have been implanted with Cr, Cu and Ar ions (4x10 16 ions/cm 2 , 60 keV) in order to distinguish between chemical and radiation damage effects on protection corrosion. The corrosion behaviour in artificial sea-water of ion-implanted and pure Ni has been studied at room temperature by electrochemical impedance spectroscopy (EIS) technique. EIS spectra of ion-implanted Ni exhibit one capacitance loop while in pure Ni two distinct loops are observed. Moreover an important increase in the polarisation resistance is noticed for all implanted ions. Theses changes in EIS behaviour with implantation is related to the increase of the superficial layer density resulting in a decrease of heterogeneity of the passive layer. Equivalent circuits are proposed to fit the impedance spectra and corresponding electrochemical parameters are deduced

  10. Anticorrosion ion implantation of fragments of zirconium fuel can specimens

    International Nuclear Information System (INIS)

    Kalin, B.A.; Osipov, V.V.; Volkov, N.V.; Khernov, V.Yu.

    2001-01-01

    Aimed at the study of specific features of oxide film formation in the initial stage of Eh110 and Eh635 alloy fuel can oxidation the modification of tubular specimen surfaces is performed using an ion mixing technique, and the structure of oxide films produced in a steam-water environment is investigated. Using the method of vacuum vapor deposition the outer surface of specimens is coated with alloying element films irradiated by a polyenergetic Ar + ion beam with a 10 keV mean energy up to radiation doses of (7-10) x 10 17 ion/cm 2 . Monatomic (Al, Fe, Cu, Cr, Mo, Sn) or diatomic (Al-Fe, Al-Mo, Al-Sn, Fe-Cu, Fe-Mo, Fe-Sn, Cr-Mo, Cr-Sn) implantation into a zirconium cladding occurs under irradiation effect. The positive influence of combined intrusion of Al and other elements is revealed. The presence of Al atoms enhances the oxide film structure. The least ZeO 2 film thickness is observed when alloying with molybdenum, Al-Fe, Al-Mo and Al-Sn [ru

  11. Large area diamond-like carbon coatings by ion implantation

    International Nuclear Information System (INIS)

    McCabe, A.R.; Proctor, G.; Jones, A.M.; Bull, S.J.; Chivers, D.J.

    1993-01-01

    Diamond-like Carbon (DLC) coatings have been deposited onto large geometry components in the Harwell Blue Tank ion implantation facility. To modify the substrate surface and to crack the low vapour pressure oil which is evaporated and condensed onto the surface, a 40 Kev nitrogen ion bucket ion source is used. The coating of areas up to 1 metre in diameter is common and with component manipulation larger areas may be coated. Since the component temperature never exceeds 80 o C during the process, a wide range of materials may be coated including specialist tool steels and even certain high density polymers. In order to produce hard wear resistant coatings with extremely low coefficients of friction (0.02-0.15) and a range of mechanical and electrical properties, various oil precursors have been investigated. The production and assessment of such coatings, including measurements of their tribiological performance, is presented. Applications for wear resistance, corrosion protection and electrically conducting coatings are discussed with examples drawn from engineering, electronics and biomedicine. (7 figures, 13 references). (UK)

  12. Introduction to several solid state techniques for the study of ion implanted materials

    International Nuclear Information System (INIS)

    Borders, J.A.

    1978-01-01

    The study of ion implanted materials requires methods which are sensitive to the local structure and chemistry of the implanted atoms. Optical spectroscopy and transmission electron microscopy are among the most useful solid state methods. Study of materials implanted to very high fluences and the use of surface analysis methods provide some unique information. The characteristics of these methods will be reviewed and examples presented which show how the techniques can be used to analyze implanted materials

  13. Dependence of the depth distribution of implanted silver ions on the temperature of irradiated glass

    CERN Document Server

    Stepanov, A L

    2001-01-01

    The peculiarities of the glass ion implantation by the silver ions in dependence on the substrate temperature within the interval of 20-100 deg C are studied. Modeling the profiles of the implanted ions distribution in depth with an account of the thermostimulated increase in the admixture diffusion mobility is carried out. It is shown, that increase in the substrate temperature leads to the diffusion wash-out of the introduced admixture ions distribution. The analysis of the modeling results indicates the necessity of strict control of the substrate temperature by the dielectrics implantation for obtaining the conditions for the metal nanoparticles synthesis

  14. Ion beam sputter modification of the surface morphology of biological implants

    Science.gov (United States)

    Weigand, A. J.; Banks, B. A.

    1976-01-01

    The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion beam sputtered surfaces.

  15. Electrical conduction in 100 keV Kr+ ion implanted poly (ethylene terephthalate)

    Science.gov (United States)

    Goyal, P. K.; Kumar, V.; Gupta, Renu; Mahendia, S.; Anita, Kumar, S.

    2012-06-01

    Polyethylene terephthalate (PET) samples have been implanted to 100 keV Kr+ ions at the fluences 1×1015-- 1×1016 cm-2. From I-V characteristics, the conduction mechanism was found to be shifted from ohmic to space charge limited conduction (SCLC) after implantation. The surface conductivity of these implanted samples was found to increase with increasing implantation dose. The structural alterations in the Raman spectra of implanted PET samples indicate that such an increase in the conductivity may be attributed to the formation of conjugated double bonded carbonaceous structure in the implanted layer of PET.

  16. A simple ion implanter for material modifications in agriculture and gemmology

    Energy Technology Data Exchange (ETDEWEB)

    Singkarat, S. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand); Wijaikhum, A. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Department of Physics, University of York, Heslington, York YO10 5DD (United Kingdom); Suwannakachorn, D.; Tippawan, U. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Intarasiri, S. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Bootkul, D. [Department of General Science, Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Phanchaisri, B.; Techarung, J. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Rhodes, M.W.; Suwankosum, R.; Rattanarin, S. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Yu, L.D., E-mail: yuld@thep-center.org [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics, Commission on Higher Education, 328 Si Ayutthaya Road, Bangkok 10400 (Thailand)

    2015-12-15

    In our efforts in developing ion beam technology for novel applications in biology and gemmology, an economic simple compact ion implanter especially for the purpose was constructed. The designing of the machine was aimed at providing our users with a simple, economic, user friendly, convenient and easily operateable ion implanter for ion implantation of biological living materials and gemstones for biotechnological applications and modification of gemstones, which would eventually contribute to the national agriculture, biomedicine and gem-industry developments. The machine was in a vertical setup so that the samples could be placed horizontally and even without fixing; in a non-mass-analyzing ion implanter style using mixed molecular and atomic nitrogen (N) ions so that material modifications could be more effective; equipped with a focusing/defocusing lens and an X–Y beam scanner so that a broad beam could be possible; and also equipped with a relatively small target chamber so that living biological samples could survive from the vacuum period during ion implantation. To save equipment materials and costs, most of the components of the machine were taken from decommissioned ion beam facilities. The maximum accelerating voltage of the accelerator was 100 kV, ideally necessary for crop mutation induction and gem modification by ion beams from our experience. N-ion implantation of local rice seeds and cut gemstones was carried out. Various phenotype changes of grown rice from the ion-implanted seeds and improvements in gemmological quality of the ion-bombarded gemstones were observed. The success in development of such a low-cost and simple-structured ion implanter provides developing countries with a model of utilizing our limited resources to develop novel accelerator-based technologies and applications.

  17. A simple ion implanter for material modifications in agriculture and gemmology

    Science.gov (United States)

    Singkarat, S.; Wijaikhum, A.; Suwannakachorn, D.; Tippawan, U.; Intarasiri, S.; Bootkul, D.; Phanchaisri, B.; Techarung, J.; Rhodes, M. W.; Suwankosum, R.; Rattanarin, S.; Yu, L. D.

    2015-12-01

    In our efforts in developing ion beam technology for novel applications in biology and gemmology, an economic simple compact ion implanter especially for the purpose was constructed. The designing of the machine was aimed at providing our users with a simple, economic, user friendly, convenient and easily operateable ion implanter for ion implantation of biological living materials and gemstones for biotechnological applications and modification of gemstones, which would eventually contribute to the national agriculture, biomedicine and gem-industry developments. The machine was in a vertical setup so that the samples could be placed horizontally and even without fixing; in a non-mass-analyzing ion implanter style using mixed molecular and atomic nitrogen (N) ions so that material modifications could be more effective; equipped with a focusing/defocusing lens and an X-Y beam scanner so that a broad beam could be possible; and also equipped with a relatively small target chamber so that living biological samples could survive from the vacuum period during ion implantation. To save equipment materials and costs, most of the components of the machine were taken from decommissioned ion beam facilities. The maximum accelerating voltage of the accelerator was 100 kV, ideally necessary for crop mutation induction and gem modification by ion beams from our experience. N-ion implantation of local rice seeds and cut gemstones was carried out. Various phenotype changes of grown rice from the ion-implanted seeds and improvements in gemmological quality of the ion-bombarded gemstones were observed. The success in development of such a low-cost and simple-structured ion implanter provides developing countries with a model of utilizing our limited resources to develop novel accelerator-based technologies and applications.

  18. A simple ion implanter for material modifications in agriculture and gemmology

    International Nuclear Information System (INIS)

    Singkarat, S.; Wijaikhum, A.; Suwannakachorn, D.; Tippawan, U.; Intarasiri, S.; Bootkul, D.; Phanchaisri, B.; Techarung, J.; Rhodes, M.W.; Suwankosum, R.; Rattanarin, S.; Yu, L.D.

    2015-01-01

    In our efforts in developing ion beam technology for novel applications in biology and gemmology, an economic simple compact ion implanter especially for the purpose was constructed. The designing of the machine was aimed at providing our users with a simple, economic, user friendly, convenient and easily operateable ion implanter for ion implantation of biological living materials and gemstones for biotechnological applications and modification of gemstones, which would eventually contribute to the national agriculture, biomedicine and gem-industry developments. The machine was in a vertical setup so that the samples could be placed horizontally and even without fixing; in a non-mass-analyzing ion implanter style using mixed molecular and atomic nitrogen (N) ions so that material modifications could be more effective; equipped with a focusing/defocusing lens and an X–Y beam scanner so that a broad beam could be possible; and also equipped with a relatively small target chamber so that living biological samples could survive from the vacuum period during ion implantation. To save equipment materials and costs, most of the components of the machine were taken from decommissioned ion beam facilities. The maximum accelerating voltage of the accelerator was 100 kV, ideally necessary for crop mutation induction and gem modification by ion beams from our experience. N-ion implantation of local rice seeds and cut gemstones was carried out. Various phenotype changes of grown rice from the ion-implanted seeds and improvements in gemmological quality of the ion-bombarded gemstones were observed. The success in development of such a low-cost and simple-structured ion implanter provides developing countries with a model of utilizing our limited resources to develop novel accelerator-based technologies and applications.

  19. Thermoluminescence of ion-implanted SiO2

    International Nuclear Information System (INIS)

    Arnold, G.W.

    1976-01-01

    Thermoluminescence (TL) has been measured from room temperature to 500 0 C for ion-implanted fused silica glasses, crystalline synthetic quartz and rf-sputtered SiO 2 films. Measurements of the TL spectra for widely varying values of electronic and atomic energy depositions, along with the known impurity concentrations of the various systems, has allowed some of the TL features to be identified. In particular, (1) a TL peak at 150 0 C in fused silica has been identified with defects formed by structural modification, (2) a 330 0 C peak in crystalline quartz and relatively impure fused silica is tentatively assigned to a center involving Al, (3) a 100 0 C peak, common to all silicas may be related to oxygen vacancies, and (4) an approximately 200 0 C peak may be the analog of the 245 nm impurity absorption band seen in some fused silica glasses

  20. Structure, morphology and melting hysteresis of ion-implanted nanocrystals

    International Nuclear Information System (INIS)

    Andersen, H.H.; Johnson, E.

    1995-01-01

    Investigations of nanosized metal and semimetal inclusions produced by ion implantation in aluminium are reviewed. The inclusions are from 1 nm to 15 nm in size and contain from 80 to 100,000 atoms. Embedded crystallites, which are topotactically aligned with the surrounding matrix, may not be produced in this size range by any other method. The inclusions offer unique possibilities for study of the influence of interfaces on the crystal structure of the inclusions as well as on their melting and solidification behaviour. Studies are made with transmission electron microscopy (TEM), electron- and x-ray diffraction and in situ RBS- channeling measurements. Bi, Cd, In, Pb and Tl inclusions all show a substantial melting/solidification temperature hysteresis, which, in all cases except for Bi, is placed around the bulk melting temperature, while bismuth melts below that temperature. (au) 46 refs

  1. Focussed MeV ion beam implanted waveguides

    Energy Technology Data Exchange (ETDEWEB)

    Von Bibra, M.L.; Roberts, A.; Nugent, K.; Jamieson, D.N. [Melbourne Univ., Parkville, VIC (Australia). School of Physics

    1996-12-31

    Single mode buried optical waveguides have been fabricated in fused silica by MeV proton implantation using a focussed hydrogen ion beam. The technique has the potential to direct write waveguide devices and produce multi-layered structures, without the need for intermediate steps such as mask fabrication or layered depositions. A micron resolution Confocal Raman Spectrometer has been used to map the distribution of atomic vacancies that forms the waveguiding region. The results are compared with theoretical calculations. Losses of 3 dB cm{sup -1} have been measured in unannealed samples, which decreases to less than 0.5 dB cm{sup -1} after annealing at 500 degrees Celsius. We describe methods for determining the refractive index distribution of single mode buried waveguides from their output intensity distributions via an inversion of the scalar wave equation. (authors). 5 figs.

  2. Development of a keV single-ion-implanter for nanofabrication

    International Nuclear Information System (INIS)

    Yang, C.; Jamieson, D.N.; Hopf, T.; Tamanyan, G.; Spizziri, P.; Pakes, C.; Andresen, S.E.; Hudson, F.; Gauja, E.; Dzurak, A.; Clark, R.G.

    2005-01-01

    Traditional methods of doping semiconductors have a difficulty meeting the demand for high precision doping due to large statistical fluctuations in the numbers of dopant atoms introduced in the ever shrinking volume in micro- and nano-electronics devices, especially when the fabrication process approaches the nanometre scale. The statistical fluctuations in doping semiconductors for the fabrication of devices with a very small feature size may lead to inconsistent and unreliable performance. This paper describes the adaptation of a commercial ion implanter into a single-ion-implantation system for the accurate delivery of dopants into a nanometre or micrometre area in a silicon substrate. All the implanted ions can be accurately counted with near 100% certainty through online detection using the silicon substrate itself as an ion detector. A variety of ion species including B + , N + , P + at the energy range of 10-15 keV can be delivered in the single ion implantation system. (author). 6 refs., 6 figs

  3. Characterization of Nitride Layers Formed by Nitrogen Ion Implantation into Surface Region of Iron

    International Nuclear Information System (INIS)

    Sudjatmoko; Subki, M. Iyos R.

    2000-01-01

    Ion implantation is a convenient means of modifying the physical and chemical properties of the near-surface region of materials. The nitrogen implantation into pure iron has been performed at room temperature with ion dose of 1.310 17 to 1.310 18 ions/cm 2 and ion energy of 20 to 100 keV. The optimum dose of nitrogen ions implanted into pure iron was around 2.2310 17 ions/cm 2 in order to get the maximum wear resistant. SEM micrographs and EDX show that the nitride layers were found on the surface of substrate. The nitrogen concentration profile was measured using EDX in combination with spot technique, and it can be shown that the depth profile of nitrogen implanted into substrate was nearly Gaussian. (author)

  4. The effect of incidence angle on disorder production in ion implanted Si

    International Nuclear Information System (INIS)

    Sukirno; Carter, G.

    1989-01-01

    Ne, Ar, Sb, and Xe ions have been implanted, at 30 keV or 80 keV and at various incidence angles, into Si substrates maintained at room temperature during implantation. Implantation-induced Si disorder was measured using Rutherford backscattering channelling. The effects upon disorder of various incidence angles were studied over a fluence range of 10 12 -10 16 ions·cm -2 . The results show that, at low fluences the lighter (Ne) and slightly heavier (Ar) ion implantations generate a bimodal disorder-depth profile, whilst at higher fluences measurements of amorphised layer thickness as a function of ion incidence angle allow values of the standard deviation of the disorder profile parallel and transverse to the ion beam direction for each ion to be obtained with good agreement to theoretical predictions. (author)

  5. Tribological properties and surface structures of ion implanted 9Cr18Mo stainless steels

    Science.gov (United States)

    Fengbin, Liu; Guohao, Fu; Yan, Cui; Qiguo, Sun; Min, Qu; Yi, Sun

    2013-07-01

    The polished quenched-and-tempered 9Cr18Mo steels were implanted with N ions and Ti ions respectively at a fluence of 2 × 1017 ions/cm2. The mechanical properties of the samples were investigated by using nanoindenter and tribometer. The results showed that the ion implantations would improve the nanohardness and tribological property, especially N ion implantation. The surface analysis of the implanted samples was carried out by using XRD, XPS and AES. It indicated that the surface exhibits graded layers after ion implantation. For N ion implantation, the surface about 20 nm thickness is mainly composed of supersaturated interstitial N solid solution, oxynitrides, CrxCy phase and metal nitrides. In the subsurface region, the metal nitrides dominate and the other phases disappear. For Ti ion implantation, the surface of about 20 nm thickness is mainly composed of titanium oxides and carbon amorphous phase, the interstitial solid solution of Ti in Fe is abundant in the subsurface region. The surface components and structures have significant contributions to the improved mechanical properties.

  6. Tribological properties and surface structures of ion implanted 9Cr18Mo stainless steels

    International Nuclear Information System (INIS)

    Fengbin, Liu; Guohao, Fu; Yan, Cui; Qiguo, Sun; Min, Qu; Yi, Sun

    2013-01-01

    The polished quenched-and-tempered 9Cr18Mo steels were implanted with N ions and Ti ions respectively at a fluence of 2 × 10 17 ions/cm 2 . The mechanical properties of the samples were investigated by using nanoindenter and tribometer. The results showed that the ion implantations would improve the nanohardness and tribological property, especially N ion implantation. The surface analysis of the implanted samples was carried out by using XRD, XPS and AES. It indicated that the surface exhibits graded layers after ion implantation. For N ion implantation, the surface about 20 nm thickness is mainly composed of supersaturated interstitial N solid solution, oxynitrides, Cr x C y phase and metal nitrides. In the subsurface region, the metal nitrides dominate and the other phases disappear. For Ti ion implantation, the surface of about 20 nm thickness is mainly composed of titanium oxides and carbon amorphous phase, the interstitial solid solution of Ti in Fe is abundant in the subsurface region. The surface components and structures have significant contributions to the improved mechanical properties

  7. N and Cr ion implantation of natural ruby surfaces and their characterization

    Science.gov (United States)

    Rao, K. Sudheendra; Sahoo, Rakesh K.; Dash, Tapan; Magudapathy, P.; Panigrahi, B. K.; Nayak, B. B.; Mishra, B. K.

    2016-04-01

    Energetic ions of N and Cr were used to implant the surfaces of natural rubies (low aesthetic quality). Surface colours of the specimens were found to change after ion implantation. The samples without and with ion implantation were characterized by diffuse reflectance spectra in ultra violet and visible region (DRS-UV-Vis), field emission scanning electron microscopy (FESEM), selected area electron diffraction (SAED) and nano-indentation. While the Cr-ion implantation produced deep red surface colour (pigeon eye red) in polished raw sample (without heat treatment), the N-ion implantation produced a mixed tone of dark blue, greenish blue and violet surface colour in the heat treated sample. In the case of heat treated sample at 3 × 1017 N-ions/cm2 fluence, formation of colour centres (F+, F2, F2+ and F22+) by ion implantation process is attributed to explain the development of the modified surface colours. Certain degree of surface amorphization was observed to be associated with the above N-ion implantation.

  8. Ion implantation artifacts observed in depth profiling boron in silicon by secondary ion mass spectrometry

    International Nuclear Information System (INIS)

    Chi, P.; Simons, D.S.

    1987-01-01

    A comparison study of depth profiling by secondary ion mass spectrometry (SIMS) and neutron depth profiling (NDP) was recently conducted. The specimens were portions of 5 cm diameter single crystal silicon slices in which B-10 had been implanted at various fluences and energies. NDP measurements were made on a 13 mm diameter area at the center of the wafers. SIMS measurements were taken from a 60 μm diameter area approximately 16 mm from the center of the wafer. One observation that emerged from this work was an apparent discrepancy between the profiles of B-10 measured by DNP and SIMS. The peaks of the SIMS profiles were typically deeper than those of NDP by as much as 30 nm, which is 10% of the projected range for a 70 keV implant. Moreover, the profiles could not be made to coincide by either a constant shift or a proportional change of one depth scale with respect to the other. The lateral inhomogeneity of boron that these experiments have demonstrated arises from the variable contribution of ion channeling during implantation

  9. Development of pulsed processes for the manufacture of solar cells. [Ion implantation and annealing process

    Energy Technology Data Exchange (ETDEWEB)

    Minnucci, J.A.

    1978-12-01

    This report describes the results of a 1-year program to develop the processes required for low-energy ion implantation for the automated production of silicon solar cells. The program included (1) demonstrating state-of-the-art ion implantation equipment and designing an automated ion implanter, (2) making efforts to improve the performance of ion-implanted solar cells to 16.5 percent AM1, (3) developing a model of the pulse annealing process used in solar cell production, and (4) preparing an economic analysis of the process costs of ion implantation. During the program, phosphorus ions at an energy of 10 keV and dose of 2 x 10/sup 15/ cm/sup -2/ were implanted in silicon solar cells to produce junctions, while boron ions at 25 keV and 5 x 10/sup 15/ cm/sup -2/ were implanted in the cells to produce effective back surface fields. An ion implantation facility with a beam current up to 4 mA and a production throughput of 300 wafers per hour was designed and installed. A design was prepared for a 100-mA, automated implanter with a production capacity of 100 MW/sub e/ per year. A Solar Array Manufacturing Industry Costing Standards (SAMICS) economic analysis of the automated process steps of ion implantation and pulse annealing indicated that junctions can be formed and annealed at a cost of less than 3 cents per watt. The efforts during this program represent a major advancement in developing the automated production of silicon solar cells with efficiencies greater than 16 percent AM1.

  10. Near-surface recrystallization of the amorphous implanted layer of ion implanted 6H-SiC

    Science.gov (United States)

    Kuhudzai, R. J.; van der Berg, N. G.; Malherbe, J. B.; Hlatshwayo, T. T.; Theron, C. C.; Buys, A. V.; Botha, A. J.; Wendler, E.; Wesch, W.

    2014-08-01

    The recrystallization and subsequent crystal growth during annealing of amorphous surface layers on 6H-SiC produced by ion implantation is investigated. Amorphous surface layers were produced by ion implantation of 360 keV ions of iodine, silver, xenon, cesium and strontium into single crystalline 6H-silicon carbide samples. The ion fluence for all the implantations were in the order of 1016 cm-2. Vacuum annealing of the damaged silicon carbide samples was then performed. The microstructure of SiC surfaces before and after annealing was investigated using a high resolution field emission scanning electron microscope (SEM). SEM analysis was complimented by Atomic Force Microscopy (AFM). SEM images acquired by an in-lens detector using an accelerating voltage of 2 kV show nano-crystallites developed for all implanted samples after annealing. Larger and more faceted crystallites along with elongated thin crystallites were observed for iodine and xenon implanted 6H-SiC. Crystallites formed on surfaces implanted with strontium and cesium were smaller and less faceted. Strontium, silver and cesium implanted samples also exhibited more cavities on the surface. AFM was used to evaluate the effect of annealing on the surface roughness. For all the amorphous surfaces which were essentially featureless, the root mean square (rms) roughness was approximately 1 nm. The roughness increased to approximately 17 nm for the iodine implanted sample after annealing with the surface roughness below this value for all the other samples. AFM also showed that the largest crystals grew to heights of about 17, 20, 45, 50 and 65 nm for Sr, Cs, Ag, Xe and I implanted samples after annealing at 1200 °C for 5 h respectively. SEM images and AFM analysis suggest that iodine is more effective in promoting crystal growth during the annealing of bombardment-induced amorphous SiC layers than the rest of the ions we implanted. In samples of silicon carbide co-implanted with iodine and silver, few

  11. Study on the Properties of 1319 nm Ultra-High Reflector Deposited by Electron Beam Evaporation Assisted by an Energetic RF Ion Source

    Directory of Open Access Journals (Sweden)

    Songwen Deng

    2018-02-01

    Full Text Available Ultra-high reflectors, working as a critical optical component, has been widely applied as a cavity mirror in fine optical systems such as laser gyro, F-P interferometer, etc. For decades, ion beam sputtering (IBS technology, which can deposit ultra-low loss and dense layers, has been commonly believed to be the only and irreplaceable method to fabricate ultra-high reflectors. Thus, reports on other methods are rare and a reflectivity above 99.99% obtained by evaporation technology (including ion assisted evaporation has not been seen yet. In the present study, an energetic radio frequency (RF ion source was introduced during the electron beam evaporation process, which improved the layer quality dramatically. An ultra-high reflector at 1319 nm with reflectivity of 99.992% (measured by cavity-ring down method was successfully deposited on a φ100 mm × 25 mm single crystal silicon substrate whose surface roughness was approximately 0.420 nm. The surface figure of the reflector was accurately controlled superior to 1/6λ (λ = 632.8 nm. The measured absorption was approximately 3–5 ppm and the calculated scatter based on surface roughness measurement was approximately 6.64 ppm. Total loss of the reflector was systematically discussed. This study showed that it is possible to apply electron beam evaporation in ultra-high reflector manufacture and the method is capable of depositing reflectors with an aperture larger than φ600 mm which is the maximum capacity of current IBS technology.

  12. High Curie temperature drive layer materials for ion-implanted magnetic bubble devices

    Science.gov (United States)

    Fratello, V. J.; Wolfe, R.; Blank, S. L.; Nelson, T. J.

    1984-01-01

    Ion implantation of bubble garnets can lower the Curie temperature by 70 C or more, thus limiting high temperature operation of devices with ion-implanted propagation patterns. Therefore, double-layer materials were made with a conventional 2-micron bubble storage layer capped by an ion-implantable drive layer of high Curie temperature, high magnetostriction material. Contiguous disk test patterns were implanted with varying doses of a typical triple implant. Quality of propagation was judged by quasistatic tests on 8-micron period major and minor loops. Variations of magnetization, uniaxial anisotropy, implant dose, and magnetostriction were investigated to ensure optimum flux matching, good charged wall coupling, and wide operating margins. The most successful drive layer compositions were in the systems (SmDyLuCa)3(FeSi)5O12 and (BiGdTmCa)3(FeSi)5O12 and had Curie temperatures 25-44 C higher than the storage layers.

  13. Ion-implantation-induced phase separation and crystallization in lithia-silica glasses

    International Nuclear Information System (INIS)

    Arnold, G.W.; Peercy, P.S.; Doyle, B.L.

    1980-01-01

    Crystallization of annealed Li 2 O.2SiO 2 glasses implanted with inert ions and fused SiO 2 glass implanted with Li ions was monitored using infrared reflection spectroscopy. Elastic recoil detection analysis was used to study changes in the Li and H concentration induced in these glasses by implantation and annealing. Implantation of Li 2 O.2SiO 2 with inert ions results in Li depletion, accompanied by H indiffusion, in the implanted region. For Li-implanted SiO 2 , crystallization of α-quartz is accompanied by appreciable Li diffusion to the surface and attendant H migration to the Li-depleted region. The crystallization mechanisms are discussed in terms of phase separation in the lithia-silica system

  14. Effect of disorder and defects in ion-implanted semiconductors optical and photothermal characterization

    CERN Document Server

    Willardson, R K; Christofides, Constantinos; Ghibaudo, Gerard

    1997-01-01

    Defects in ion-implanted semiconductors are important and will likely gain increased importance as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer after high temperature annealing. The editors of this volume and Volume 45 focus on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. Key Features * Provides basic knowledge of ion implantation-induced defects * Focuses on physical mechanisms of defect annealing * Utilizes electrical, physical, and optical characterization tools for processed semiconductors * Provides the basis for understanding the problems caused by the defects g...

  15. Investigation of Steel Surfaces Treated by a Hybrid Ion Implantation Technique

    International Nuclear Information System (INIS)

    Reuther, H.; Richter, E.; Prokert, F.; Ueda, M.; Beloto, A. F.; Gomes, G. F.

    2004-01-01

    Implantation of nitrogen ions into stainless steel in combination with oxidation often results in a decrease or even complete removal of the chromium in the nitrogen containing outermost surface layer. While iron nitrides can be formed easily by this method, due to the absence of chromium, the formation of chromium nitrides is impossible and the beneficial influence of chromium in the steel for corrosion resistance cannot be used. To overcome this problem we use the following hybrid technique. A thin chromium layer is deposited on steel and subsequently implanted with nitrogen ions. Chromium can be implanted by recoil into the steel surface and thus the formation of iron/chromium nitrides should be possible. Both beam line ion implantation and plasma immersion ion implantation are used. Due to the variation of the process parameters, different implantation profiles and different compounds are produced. The produced layers are characterized by Auger electron spectroscopy, conversion electron Moessbauer spectroscopy and X-ray diffraction. The obtained results show that due to the variation of the implantation parameters, the formation of iron/chromium nitrides can be achieved and that plasma immersion ion implantation is the most suitable technique for the enrichment of chromium in the outermost surface layer of the steel when compared to the beam line implantation.

  16. Heavy doping of CdTe single crystals by Cr ion implantation

    Science.gov (United States)

    Popovych, Volodymyr D.; Böttger, Roman; Heller, Rene; Zhou, Shengqiang; Bester, Mariusz; Cieniek, Bogumil; Mroczka, Robert; Lopucki, Rafal; Sagan, Piotr; Kuzma, Marian

    2018-03-01

    Implantation of bulk CdTe single crystals with high fluences of 500 keV Cr+ ions was performed to achieve Cr concentration above the equilibrium solubility limit of this element in CdTe lattice. The structure and composition of the implanted samples were studied using secondary ion mass spectrometry (SIMS), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, X-ray diffraction (XRD) and Rutherford backscattering spectrometry (RBS) to characterize the incorporation of chromium into the host lattice and to investigate irradiation-induced damage build-up. It was found that out-diffusion of Cr atoms and sputtering of the targets alter the depth distribution and limit concentration of the projectile ions in the as-implanted samples. Appearance of crystallographically oriented, metallic α-Cr nanoparticles inside CdTe matrix was found after implantation, as well as a strong disorder at the depth far beyond the projected range of the implanted ions.

  17. Surface potential measurement of the insulator with secondary electron caused by negative ion implantation

    International Nuclear Information System (INIS)

    Tsuji, Hiroshi; Toyota, Yoshitaka; Nagumo, Syoji; Gotoh, Yasuhito; Ishikawa, Junzo; Sakai, Shigeki; Tanjyo, Masayasu; Matsuda, Kohji.

    1994-01-01

    Ion implantation has the merit of the good controllability of implantation profile and low temperature process, and has been utilized for the impurity introduction in LSI production. However, positive ion implantation is carried out for insulator or insulated conductor substrates, their charged potential rises, which is a serious problem. As the requirement for them advanced, charge compensation method is not the effective means for resolving it. The negative ion implantation in which charging is little was proposed. When the experiment on the negative ion implantation into insulated conductors was carried out, it was verified that negative ion implantation is effective as the implantation process without charging. The method of determining the charged potential of insulators at the time of negative ion implantation by paying attention to the energy distribution of the secondary electrons emitted from substrates at the time was devised. The energy analyzer for measuring the energy distribution of secondary electrons was made, and the measurement of the charged potential of insulators was carried out. The principle of the measurement, the measuring system and the experimental results are reported. (K.I.)

  18. Applications of ion implantation for modifying the interactions between metals and hydrogen gas

    Science.gov (United States)

    Musket, R. G.

    1989-04-01

    Ion implantations into metals have been shown recently to either reduce or enhance interactions with gaseous hydrogen. Published studies concerned with modifications of these interactions are reviewed and discussed in terms of the mechanisms postulated to explain the observed changes. The interactions are hydrogenation, hydrogen permeation, and hydrogen embrittlement. In particular, the results of the reviewed studies are (a) uranium hydriding suppressed by implantation of oxygen and carbon, (b) hydrogen gettered in iron and nickel using implantation of titanium, (c) hydriding of titanium catalyzed by implanted palladium, (d) tritium permeation of 304L stainless steel reduced using selective oxidation of implanted aluminum, and (e) hydrogen attack of a low-alloy steel accelerated by implantation of helium. These studies revealed ion implantation to be an effective method for modifying the interactions of hydrogen gas with metals.

  19. Applications of ion implantation for modifying the interactions between metals and hydrogen gas

    International Nuclear Information System (INIS)

    Musket, R.G.

    1989-01-01

    Ion implantations into metals have been shown recently to either reduce or enhance interactions with gaseous hydrogen. Published studies concerned with modifications of these interactions are reviewed and discussed in terms of the mechanisms postulated to explain the observed changes. The interactions are hydrogenation, hydrogen permeation and hydrogen embrittlement. In particular, the results of the reviewed studies are 1. uranium hydriding suppressed by implantation of oxygen and carbon, 2. hydrogen gettered in iron and nickel using implantation of titanium, 3. hydriding of titanium catalyzed by implanted palladium, 4. tritium permeation of 304L stainless steel reduced using selective oxidation of implanted aluminum, and 5. hydrogen attack of a low-alloy steel accelerated by implantation of helium. These studies revealed ion implantation to be an effective method for modifying the interactions of hydrogen gas with metals. (orig.)

  20. Effects of ion implantation on the abrasive wear of WC-Co

    International Nuclear Information System (INIS)

    Bartolucci Luyckx, S.; Sellschop, J.P.F.

    1988-01-01

    An explanation of the improved abrasive wear resistance of ion-implanted WC-Co components has been sought. X-ray analysis is reported of scratches produced on polished implanted and non-implanted WC-Co surfaces by a single pass scratch test. It can be inferred from the results that extrusion of cobalt from a WC-Co surface under the stress of an abrading diamond is easier in the non-implanted than in the implanted case; this is the first stage of the abrasion wear process. Transmission electron diffraction of a WC-Co foil, before and after implantation by nitrogen ions, indicated the formation of Co 2 N microprecipitates during implantation. Precipitation hardening, hindering cobalt extrusion, is offered therefore as the explanation of the improved service life of the components. (U.K.)

  1. Cell adhesion control by ion implantation into extra-cellular matrix

    International Nuclear Information System (INIS)

    Suzuki, Yoshiaki; Kusakabe, Masahiro; Kaibara, Makoto; Iwaki, Masaya; Sasabe, Hiroyuki; Nishisaka, Tsuyoshi

    1994-01-01

    Cell adhesion control of polymer surfaces by ion implantation into polymers and extra-cellular matrix has been studied by means of in vitro adhesion measurements of the carcinoma of the cervix (HeLa cell). The specimens used were polystyrene (PS), oxygen plasma treated polystyrene (PS-O), extra-cellular matrix (Collagen: Type I) coated polystyrene (PS-C), and gelatin coated polystyrene (PS-G). Ne + , Na + , and Ar + implantations were performed with a fluence of 1x10 15 ions/cm 2 at energies of 50, 100 and 150 keV. The chemical and physical structures of ion implanted specimens have been investigated by Fourier transform infrared spectroscopy (FT-IR-ATR), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. Ion implanted PS demonstrated a dramatic improvement of adhesion of HeLa cell. HeLa cell adhered only to ion implanted circular domains of a diameter about 0.1 mm on PS. By contrast, ion implanted PS-C, PS-G and PS-O domains inhibited the cell adhesion. These phenomena were observed on Ne + , Na + , and Ar + implanted specimens at energies of 50, 100, and 150 keV. Ion implantation broke the original chemical bonds to form new radicals such as =C=O, condensed rings, C-C, C-O and OH radical. Ion implanted PS had a large amount of new radicals compared with that of PS-C, PS-G and PS-O. Ion implantation broke NH and NH 3 bonds originating from amino acid in PS-C and PS-G. OH and =C=O caused by oxygen treatment in PS-O were also destroyed by ion implantation. It is concluded that cell adhesion to ion implanted PS was caused by carbon structure and new radicals induced by ion implantation. The inhibition of HeLa cell adhesion on PS-C, PS-G and PS-O was caused by the destruction of cell adhesion properties of amino acid, OH and =C=O by radiation effects. ((orig.))

  2. Quartz modification by Zn ion implantation and swift Xe ion irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Privezentsev, Vladimir [Institute of Physics and Technology, Russian Academy of Sciences, Moscow (Russian Federation); Kulikauskas, Vaclav [Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University (Russian Federation); Didyk, Alexander; Skuratov, Vladimir [Joint Institute of Nuclear Research, Dubna (Russian Federation); Steinman, Edward; Tereshchenko, Alexey; Kolesnikov, Nikolay [Institute of Solid-State Physics, Russian Academy of Sciences, Chernogolovka (Russian Federation); Trifonov, Alexey; Sakharov, Oleg [National Research University ' ' MIET' ' , Zelenograd, Moscow (Russian Federation); Ksenich, Sergey [National University of Science and Technology ' ' MISiS' ' , Moscow (Russian Federation)

    2017-07-15

    The quartz slides were implanted by {sup 64}Zn{sup +} ions with dose of 5 x 10{sup 16}/cm{sup 2} and energy of 100 keV. After implantation, the amorphous metallic Zn nanoparticles with an average radius of 3.5 nm were created. The sample surface becomes nonuniform, its roughness is increased and its values rise up to 6 nm compared to virgin state, and the roughness maximum is at a value of about 0.8 nm. The surface is made up of valleys and hillocks which have a round shape with an average diameter about 200 nm. At the center of these hillocks are pores with a depth up to 6 nm and a diameter of about 20 nm. After implantation in UV-vis diapason, the optical transmission decreases while PL peak (apparently due to oxygen deficient centers) at wavelength of 400 nm increases. Then the samples were subjected to swift Xe ion irradiation with the fluences of 1 x 10{sup 12}-7.5 x 10{sup 14}/cm{sup 2} and energy of 167 MeV. After Xe irradiation, the sample surface roughness shat down to values of 0.5 nm and the roughness maximum is at a value of about 0.1 nm. Optical transmission in UV-vis diapason increases. The PL peak at wavelength of 400 nm is decreased while a PL peak at wavelength of 660 nm is raised. This peak is presumably due to non-bridging oxygen hole centers or/and NPs with structure Si(core)/SiO{sub 2}(shell). HRTEM image of Zn-implanted quartz subsurface layer. One can see the Zn amorphous nanoparticles, which confirms the electron diffraction pattern (insert). (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  3. In-Situ Photoexcitation-Induced Suppression of Point Defect Generation in Ion Implanted Silicon

    International Nuclear Information System (INIS)

    Cho, C.R.; Rozgonyi, G.A.; Yarykin, N.; Zuhr, R.A.

    1999-01-01

    The formation of vacancy-related defects in n-type silicon has been studied immediately after implantation of He, Si, or Ge ions at 85 K using in-situ DLTS. A-center concentrations in He-implanted samples reach a maximum immediately after implantation, whereas, with Si or Ge ion implanted samples they continuously increase during subsequent anneals. It is proposed that defect clusters, which emit vacancies during anneals, are generated in the collision cascades of Si or Ge ions. An illumination-induced suppression of A-center formation is seen immediately after implantation of He ions at 85 K. This effect is also observed with Si or Ge ions, but only after annealing. The suppression of vacancy complex formation via photoexcitation is believed to occur due to an enhanced recombination of defects during ion implantation, and results in reduced number of vacancies remaining in the defect clusters. In p-type silicon, a reduction in K-center formation and an enhanced migration of defects are concurrently observed in the illuminated sample implanted with Si ions. These observations are consistent with a model where the injection of excess carriers modifies the defect charge state and impacts their diffusion

  4. Lattice location of platinum ions implanted into single crystal zirconia and their annealing behaviour

    Energy Technology Data Exchange (ETDEWEB)

    Cao, D.X. [Royal Melbourne Inst. of Tech., VIC (Australia); Sood, D.K. [Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Nuclear Research; Brown, I.G. [Lawrence Berkeley Lab., CA (United States)

    1993-12-31

    Single crystal samples of (100) oriented cubic zirconia stabilised with 9.5 mol % yttria were implanted with platinum ions, using a metal vapour vacuum arc (MEVVA) high current ion implanter, to a nominal dose of 1x10{sup 17} ions/cm{sup 2}. The implanted samples were annealed isothermally in air ambient at 1200 deg C, from 1-24 hours. Rutherford Backscattering Spectrometry and Channeling (RBSC) of 2 MeV He ions are employed to determine depth distributions of ion damage, Pt ions and substitutionality of Pt ions before and after annealing. The damage behaviour, Pt migration and lattice location are discussed in terms of metastable phase formation and solid solubility considerations. 7 refs., 3 figs.

  5. TEM study of the ion beam induced damage during 14 kev P+ implantation in silicon

    International Nuclear Information System (INIS)

    Rubanov, S.; Tamanyan, G.; Hudson, F.; Jamieson, D.N.; McCallum, J.C.; Prawer, S.

    2005-01-01

    The proposed silicon-based quantum computer architecture comprises an array of phosphorus donor atoms (qubits) positioned with nanometre accuracy beneath the surface of a semiconductor host, using a single ion implantation technique. The average depth of the implanted ions (the projected range R p ), lateral range R p 1, and the distribution of ions about that depth can be approximated as two-dimensional Gaussian with standard deviation ΔR p and ΔR p 1 (lateral straggle). Using transmission electron microscopy (TEM) we studied ion beam induced damage after 14 keV P + implantation in Si. The TEM images allowed us to compare the depth of the amorphous cluster formation to R p , R p 1, ΔR p 1 calculated from SRIM and hence determine evidence for the limitation on the accuracy of the position of the implanted ions imposed by straggling. (author). 4 refs., 3 figs

  6. The protective effects of glycerine on mammalian cells in ion implantation

    International Nuclear Information System (INIS)

    Feng Huiyun; Yu Lixiang; Liu Xinghai; Wu Lijun

    2002-03-01

    The discovery of bio-effects induced by ion implantation has opened a novel branch in the field of radiation biology-the low energy heavy ion biology. The experimental samples in the field have, however, been within the limits of plants and microbes because of the sample's vacuum-resistant ability. The mutation studying of mammalian cells with ion implantation hasn't been reported in the past years. Main reason for that is that it is difficult to keep mammalian cells alive in vacuum during ion implantation. In the present study, the tolerance of mammalian cells in vacuum was enhanced efficiently by pre-treatment with glycerin at low concentration and proper treatment time, which provide a new way for the study on the biological effects of ion beam implantation in the mammalian cells

  7. The Effects of Ion Implantation on Friction and Wear of Metals.

    Science.gov (United States)

    1981-05-01

    34The Effect of Ion Implatation on the Corrosion Behavior of Fe," Proc. of the International Conf. on Ion Implantation in Semiconductors and Other...al., "The Effects of Yttrium Ion -146- Implatation Upon the Oxidation Behavior of an Austenitic Stainless Steel," Proc. of the International Conf. on

  8. The effects of ion implantation upon the mechanical properties of metals and cemented carbides

    International Nuclear Information System (INIS)

    Dearnaley, G.

    1982-01-01

    Ion implantation has been successful in producing significant improvements in the wear resistance and fatigue endurance of metals such as steel, titanium, copper and electrodeposited chromium. Models to explain this behaviour in terms of the pinning of mobile dislocations are presented. Friction coefficients are also modified by ion implantation, and in the composite material cobalt-cemented tungsten carbide this effect is very strong, and is accompanied by a reduction in wear. Examples of the range of tools which have been improved by nitrogen ion implantation are given, and the review concludes with a description of the equipment developed for the industrial application of this process. (author)

  9. Corrosion resistance study of grey cast iron implanted with C, N, Cr and Cu ions

    Science.gov (United States)

    Usanova, O. Yu; Maryushin, L. A.; Kazantsev, A. Yu; Dyukova, A. I.

    2017-10-01

    This article deals with the corrosion resistance of gray cast iron implanted with C, N, Cr and Cu ions in sodium chloride solution and sulfuric acid solution. The potentiodynamic research was conducted in atmosphere, simulating corrosion conditions: in 3% sodium chloride solution and in 0,1 N sulfuric acid solution. Potentiodynamic curves were obtained and surfaces of samples were observed. The research proves that the implantation of ions with N and Cr leads to an increase in the corrosion resistance of cast iron in sodium chloride solution, and the implantation of ions with N and Cu leads to increased corrosion resistance in sulfuric acid solution.

  10. Comparison of iron ion implantation effects in bubble garnet and YAG

    International Nuclear Information System (INIS)

    Marest, G.; Perez, A.; Gerard, P.

    1984-06-01

    Ferrimagnetic bubble garnets and YAG single crystals were implanted at room temperature with 100 keV 57 Fe + ions in the dose range 10 16 up to 10 17 ions.cm 2 . The samples were analyzed using the conversion electron Moessbauer spectroscopy technique. In both materials implanted iron is found in three states: metallic precipitates, Fe 2+ and Fe 3+ with the dominant role for Fe 3+ in bubble garnet whereas metallic precipitates constitute the main component in YAG. The existence and the different behaviour of these species as a function of implanted ion dose are discussed taking into account the nature of the elements present in the two targets

  11. Algorithm for statistical noise reduction in three-dimensional ion implant simulations

    Science.gov (United States)

    Hernández-Mangas, J. M.; Arias, J.; Jaraiz, M.; Bailón, L.; Barbolla, J.

    2001-05-01

    As integrated circuit devices scale into the deep sub-micron regime, ion implantation will continue to be the primary means of introducing dopant atoms into silicon. Different types of impurity profiles such as ultra-shallow profiles and retrograde profiles are necessary for deep submicron devices in order to realize the desired device performance. A new algorithm to reduce the statistical noise in three-dimensional ion implant simulations both in the lateral and shallow/deep regions of the profile is presented. The computational effort in BCA Monte Carlo ion implant simulation is also reduced.

  12. Shape memory effect and superelasticity of titanium nickelide alloys implanted with high ion doses

    International Nuclear Information System (INIS)

    Pogrebnjak, A D; Bratushka, S N; Beresnev, V M; Levintant-Zayonts, N

    2013-01-01

    The state of the art in ion implantation of superelastic NiTi shape memory alloys is analyzed. Various technological applications of the shape memory effect are outlined. The principles and techiques of ion implantation are described. Specific features of its application for modification of surface layers in surface engineering are considered. Key properties of shape memory alloys and problems in utilization of ion implantation to improve the surface properties of shape memory alloys, such as corrosion resistance, friction coefficient, wear resistance, etc. are discussed. The bibliography includes 162 references

  13. Carbon Ion Implantation: A Good Method to Enhance the Biocompatibility of Silicone Rubber.

    Science.gov (United States)

    Zhou, Xin; Chen, Xing; Mao, Tong-cun; Li, Xiang; Shi, Xiao-hua; Fan, Dong-li; Zhang, Yi-ming

    2016-04-01

    Silicone rubber and silicone rubber-based materials have been used as medical tissue implants in the field of plastic surgery for many years, but there are still some reports of adverse reactions to long-term implants. Earlier studies have shown that ion implantation could enhance the biocompatibility of biomaterials. However, whether ion implantation has a good effect on silicone rubber is unknown. Three types of carbon ion silicone rubber were obtained by implanting three doses of carbon ions. Then, the antibacterial adhesion properties and the in vivo host responses were evaluated. The antibacterial adhesion properties were examined by plate colony counting, fluorescence staining, and scanning electron microscopic observation. The host responses were evaluated by surveying inflammation and fiber capsule formation that developed after subcutaneous implantation in Sprague-Dawley rats for 7, 30, 90, and 180 days. In addition, the possible mechanism by which ion implantation enhanced the biocompatibility of the biomaterial was investigated and discussed. Carbon ion silicone rubber exhibits less bacterial adhesion, less collagen deposition, and thinner and weaker tissue capsules. Immunohistochemical staining results for CD4, tumor necrosis factor-α, α-smooth muscle actin, and elastin showed the possible mechanism enhancing the biocompatibility of silicone rubber. These data indicate that carbon ion silicone rubber exhibits good antibacterial adhesion properties and triggers thinner and weaker tissue capsules. In addition, high surface roughness and high zeta potential may be the main factors that induce the unique biocompatibility of carbon ion silicone rubber. Ion implantation should be considered for further investigation and application, and carbon ion silicone rubber could be a better biomaterial to decrease silicone rubber-initiated complications.

  14. Decrease of Staphylococcal adhesion on surgical stainless steel after Si ion implantation

    International Nuclear Information System (INIS)

    Braceras, Iñigo; Pacha-Olivenza, Miguel A.; Calzado-Martín, Alicia; Multigner, Marta; Vera, Carolina; Broncano, Luis Labajos-; Gallardo-Moreno, Amparo M.; González-Carrasco, José Luis; Vilaboa, Nuria

    2014-01-01

    Highlights: • Si ion implantation of AISI 316LVM medical grade alloy might reduce bacterial adhesion and colonization. • Si ion implantation does not impair the attachment, viability and matrix maturation of human mesenchymal stem cells. • Nano-topography and surface chemistry changes account for the Si ion implantation induced effects. - Abstract: 316LVM austenitic stainless steel is often the material of choice on temporal musculoskeletal implants and surgical tools as it combines good mechanical properties and acceptable corrosion resistance to the physiologic media, being additionally relatively inexpensive. This study has aimed at improving the resistance to bacterial colonization of this surgical stainless steel, without compromising its biocompatibility and resistance. To achieve this aim, the effect of Si ion implantation on 316LVM has been studied. First, the effect of the ion implantation parameters (50 keV; fluence: 2.5–5 × 10 16 ions/cm 2 ; angle of incidence: 45–90°) has been assessed in terms of depth profiling of chemical composition by XPS and nano-topography evaluation by AFM. The in vitro biocompatibility of the alloy has been evaluated with human mesenchymal stem cells. Finally, bacterial adhesion of Staphylococcus epidermidis and Staphylococcus aureus on these surfaces has been assessed. Reduction of bacterial adhesion on Si implanted 316LVM is dependent on the implantation conditions as well as the features of the bacterial strains, offering a promising implantable biomaterial in terms of biocompatibility, mechanical properties and resistance to bacterial colonization. The effects of surface composition and nano-topography on bacterial adhesion, directly related to ion implantation conditions, are also discussed

  15. Decrease of Staphylococcal adhesion on surgical stainless steel after Si ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Braceras, Iñigo, E-mail: inigo.braceras@tecnalia.com [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Pacha-Olivenza, Miguel A. [CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Universidad de Extremadura, Departamento de Física Aplicada, Facultad de Ciencias, Av. Elvas s/n, 06006 Badajoz (Spain); Calzado-Martín, Alicia [Hospital Universitario La Paz-IdiPAZ, Paseo de la Castellana 261, 28046 Madrid (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Multigner, Marta [Centro Nacional de Investigaciones Metalúrgicas, CENIM-CSIC, Avda Gregorio del Amo 8, 28040 Madrid (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Vera, Carolina [Tecnalia, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Broncano, Luis Labajos-; Gallardo-Moreno, Amparo M. [Universidad de Extremadura, Departamento de Física Aplicada, Facultad de Ciencias, Av. Elvas s/n, 06006 Badajoz (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); González-Carrasco, José Luis [Centro Nacional de Investigaciones Metalúrgicas, CENIM-CSIC, Avda Gregorio del Amo 8, 28040 Madrid (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); Vilaboa, Nuria [Hospital Universitario La Paz-IdiPAZ, Paseo de la Castellana 261, 28046 Madrid (Spain); CIBER de Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN) (Spain); and others

    2014-08-15

    Highlights: • Si ion implantation of AISI 316LVM medical grade alloy might reduce bacterial adhesion and colonization. • Si ion implantation does not impair the attachment, viability and matrix maturation of human mesenchymal stem cells. • Nano-topography and surface chemistry changes account for the Si ion implantation induced effects. - Abstract: 316LVM austenitic stainless steel is often the material of choice on temporal musculoskeletal implants and surgical tools as it combines good mechanical properties and acceptable corrosion resistance to the physiologic media, being additionally relatively inexpensive. This study has aimed at improving the resistance to bacterial colonization of this surgical stainless steel, without compromising its biocompatibility and resistance. To achieve this aim, the effect of Si ion implantation on 316LVM has been studied. First, the effect of the ion implantation parameters (50 keV; fluence: 2.5–5 × 10{sup 16} ions/cm{sup 2}; angle of incidence: 45–90°) has been assessed in terms of depth profiling of chemical composition by XPS and nano-topography evaluation by AFM. The in vitro biocompatibility of the alloy has been evaluated with human mesenchymal stem cells. Finally, bacterial adhesion of Staphylococcus epidermidis and Staphylococcus aureus on these surfaces has been assessed. Reduction of bacterial adhesion on Si implanted 316LVM is dependent on the implantation conditions as well as the features of the bacterial strains, offering a promising implantable biomaterial in terms of biocompatibility, mechanical properties and resistance to bacterial colonization. The effects of surface composition and nano-topography on bacterial adhesion, directly related to ion implantation conditions, are also discussed.

  16. Fractal pattern growth in Ti-implanted steel with high ion flux

    International Nuclear Information System (INIS)

    Zhang Tonghe; Wu Yuguang; Liu Andong

    2002-01-01

    The author report on the formation of metal nano-metre phase and fractal patterns in steel using metal vapour vacuum arc source ion implantation with high ion flux. The dense nano-metre phases are cylindrical and well dispersed in the Ti-implanted layer with an ion flux up to 50 μA/cm 2 . The collision fractal pattern is formed in Ti-implanted steel with an ion flux of 25 μA/cm 2 and the disconnected fractal pattern is observed with an ion flux of 50μA/cm 2 . The average density of nano-metre phases decreases from 1.2 x 10 11 /cm 2 to 6.5 x 10 10 /cm 2 as the ion flux increases from 25 μA/cm 2 to 50 μA/cm 2 . Fractal pattern growth is in remarkable agreement with Sander's diffusion-limited aggregation model. The alloy clusters have diffused and aggregated in chains forming branches to grow a beautiful tree during Ti implantation with an ion flux ranging from 75 μA/cm 2 to 85 μA/cm 2 . The authors discuss the model of fractal pattern growth during ion implantation with high ion flux

  17. Programme and abstracts of the seventh International Conference on Ion Implantation and other Applications of Ions and Electrons (ION 2008)

    International Nuclear Information System (INIS)

    2008-01-01

    The conference is organized on the biennial basis by the Institute of Physics, Maria Curie-Sklodowska University, Lublin in cooperation with the Wroclaw University of Technology and Technical University of Lublin. This biennial conferences has created a unique opportunity for scientists from Eastern and Western Europe together with their Polish colleagues, to discuss in a most agreeable environment, some of the fundamental questions in their field and develop new perspectives through the mutual exchange of ideas. ION 2008 has been focused mainly on ion implantation, a powerful tool for the modification of the subsurface layers of solid materials. Although the technique has been in use in the electronic industry for a few decades, there still remain many phenomena involved in the implantation process that are not well understood and are of considerable interest, for both fundamental science and also for new developments in applied materials science. One can highlight, in particular, mechanisms of ion energy loss in the bombarded material, creation of radiation defects, the formation of latent tracks, and many other phenomena that researchers are now intensively investigating. An improved understanding of such processes is essential for the effective application of analytical techniques like RBS, ERD, SIMS, PIPE and others

  18. Influence of implantation of three metallic ions on the mechanical properties of two polymers

    Energy Technology Data Exchange (ETDEWEB)

    Swain, M.V. [Commonwealth Scientific and Industrial Research Organisation (CSIRO), Lindfield, NSW (Australia). Div. of Applied Physics; Perry, A.J. [Australian National Univ., Canberra, ACT (Australia); Treglio, J.R.

    1996-12-31

    Ion implantation of poly ethylene terephthalate (PET) and polystyrene (PS) with various high energy metallic ions at 70 kV to dose of 3 x 10{sup 16} ions/cm 2 have been made. Measurements of the mechanical properties of the polymers before and after implantation have been made with an ultra microindentation system using both pointed and a small (2 nm) radiused spherical tipped indenter. Significant differences have been observed between the Ti-B dual implanted surfaces and those of the Au and W implanted surfaces. For both the PET and PS the resistance to indenter penetration at very low loads was much greater for the Ti-B dual implanted surfaces. The estimated hardness and modulus versus depth of penetration for both indenters shows that the spherical indenter produces more consistent and less controversial values that are somewhat lower than the optimistic estimates from pointed indenters. 8 refs., 2 fig.

  19. Current control for magnetized plasma in direct-current plasma-immersion ion implantation

    International Nuclear Information System (INIS)

    Tang Deli; Chu, Paul K.

    2003-01-01

    A method to control the ion current in direct-current plasma-immersion ion implantation (PIII) is reported for low-pressure magnetized inductively coupled plasma. The ion current can be conveniently adjusted by applying bias voltage to the conducting grid that separates plasma formation and implantation (ion acceleration) zones without the need to alter the rf input power, gas flux, or other operating conditions. The ion current that diminishes with an increase in grid bias in magnetized plasmas can be varied from 48 to 1 mA by increasing the grid voltage from 0 to 70 V at -50 kV sample bias and 0.5 mTorr hydrogen pressure. High implantation voltage and monoenergetic immersion implantation can now be achieved by controlling the ion current without varying the macroscopic plasma parameters. The experimental results and interpretation of the effects are presented in this letter. This technique is very attractive for PIII of planar samples that require on-the-fly adjustment of the implantation current at high implantation voltage but low substrate temperature. In some applications such as hydrogen PIII-ion cut, it may obviate the need for complicated sample cooling devices that must work at high voltage

  20. Effect of ion implantation on thermal shock resistance of magnesia and glass

    International Nuclear Information System (INIS)

    Gurarie, V.N.; Williams, J.S.; Watt, A.J.

    1995-01-01

    Monocrystals of magnesia together with glass samples have been subjected to ion implantation prior to thermal shock testing in an impulse plasma of continuously varied intensity. Measurements of the separation between fragments have been used to estimate the surface temperature. Fracture and deformation characteristics of the surface layer are measured in ion implanted and unimplanted samples using optical and scanning electron microscopy. Implantation-induced near-surface damage is analysed by ion channeling using 2 MeV He + ions. Ion implantation is shown to modify the near-surface structure of magnesia samples by introducing damage, which makes crack initiation easier under thermal stresses. The fracture threshold and maximum crack density are shifted towards the lower temperature range. Ion implanted MgO crystals show a ten fold increase in surface crack density. An increased crack density results in a decreased degree of damage characterised by the depth of crack penetration. The thermal stress resistance parameter of glass samples is increased at relatively small doses and decreased at higher doses. The results suggest that crack density and the degree of fracture damage in brittle ceramics operating under thermal shock conditions can be effectively controlled by ion implantation which provides crack initiating defects in the near-surface region. 23 refs., 7 figs

  1. Properties of ion implanted Ti-6Al-4V processed using beamline and PSII techniques

    International Nuclear Information System (INIS)

    Walter, K.C.; Woodring, J.S.; Nastasi, M.; Munson, C.M.; Williams, J.M.; Poker, D.B.

    1996-01-01

    The surface of Ti-6Al-4V (Ti64) alloy has been modified using beamline implantation of boron. In separate experiments, Ti64 has been implanted with nitrogen using a plasma source ion implantation (PSII) technique utilizing either ammonia (NH 3 ), nitrogen (N 2 ), or their combinations as the source of nitrogen ions. Beamline experiments have shown the hardness of the N-implanted surface saturates at a dose level of ∼ 4 x 10 17 at/cm 2 at ∼ 10 GPa. The present work makes comparisons of hardness and tribological tests of (1) B implantation using beamline techniques, and (2) N implanted samples using ammonia and/or nitrogen gas in a PSII process. The results show that PSII using N 2 or NH 3 gives similar hardness as N implantation using a beamline process. The presence of H in the Ti alloy surface does not affect the hardness of the implanted surface. Boron implantation increased the surface hardness by as much as 2.5x at the highest dose level. Wear testing by a pin-on-disk method indicated that nitrogen implantation reduced the wear rate by as much as 120x, and boron implantation reduced the wear rate by 6.5x. Increased wear resistance was accompanied by a decreased coefficient of friction

  2. Multifunctions of dual Zn/Mg ion co-implanted titanium on osteogenesis, angiogenesis and bacteria inhibition for dental implants.

    Science.gov (United States)

    Yu, Yiqiang; Jin, Guodong; Xue, Yang; Wang, Donghui; Liu, Xuanyong; Sun, Jiao

    2017-02-01

    In order to improve the osseointegration and long-term survival of dental implants, it is urgent to develop a multifunctional titanium surface which would simultaneously have osteogeneic, angiogeneic and antibacterial properties. In this study, a potential dental implant material-dual Zn/Mg ion co-implanted titanium (Zn/Mg-PIII) was developed via plasma immersion ion implantation (PIII). The Zn/Mg-PIII surfaces were found to promote initial adhesion and spreading of rat bone marrow mesenchymal stem cells (rBMSCs) via the upregulation of the gene expression of integrin α1 and integrin β1. More importantly, it was revealed that Zn/Mg-PIII could increase Zn 2+ and Mg 2+ concentrations in rBMSCs by promoting the influx of Zn 2+ and Mg 2+ and inhibiting the outflow of Zn 2+ , and then could enhance the transcription of Runx2 and the expression of ALP and OCN. Meanwhile, Mg 2+ ions from Zn/Mg-PIII increased Mg 2+ influx by upregulating the expression of MagT1 transporter in human umbilical vein endothelial cells (HUVECs), and then stimulated the transcription of VEGF and KDR via activation of hypoxia inducing factor (HIF)-1α, thus inducing angiogenesis. In addition to this, it was discovered that zinc in Zn/Mg-PIII had certain inhibitory effects on oral anaerobic bacteria (Pg, Fn and Sm). Finally, the Zn/Mg-PIII implants were implanted in rabbit femurs for 4 and 12weeks with Zn-PIII, Mg-PIII and pure titanium as controls. Micro-CT evaluation, sequential fluorescent labeling, histological analysis and push-out test consistently demonstrated that Zn/Mg-PIII implants exhibit superior capacities for enhancing bone formation, angiogenesis and osseointegration, while consequently increasing the bonding strength at bone-implant interfaces. All these results suggest that due to the multiple functions co-produced by zinc and magnesium, rapid osseointegration and sustained biomechanical stability are enhanced by the novel Zn/Mg-PIII implants, which have the potential

  3. A study of strengthening mechanism for high energy titanium ion implantation into H13 steel

    International Nuclear Information System (INIS)

    Zhang Tonghe; Chen Jun

    1995-05-01

    The strengthening mechanism of high energy titanium ion implanted H13 steel was studied. The results shown that several kinds of strengthening factors played a part in strengthening together when the high energy titanium ions were implanted into H13 steel. The solution strengthening and dislocation strengthening were dominated if Ti ions were implanted with high dose at low temperature. The strengthening effects were increased. The Fe 2 Ti and TiC phases were formed in H13 steel when the Ti ions were implanted with high dose at 400 degree C. The dispersion strengthening phases of Fe 2 Ti and TiC were appeared. The strengthening effects are better than before. The hardness increased 3.2 times, the wear resistance increased 11 times. (2 tabs., 7 figs.)

  4. Ion implantation: [fundamental factors which affect accelerator performance and their implications

    International Nuclear Information System (INIS)

    Armour, D.G.

    1987-01-01

    The use of ion implantation to modify the composition of the near surface layers of solid materials has been widely exploited in the semiconductor industry and is finding increasing application in the treatment of metals, ceramics and polymers. The bombardment of a solid with energetic ions inevitably involves the deposition of energy as well as material and this effect, which results in unwanted effects such as radiation damage in conventional implantation situations, is also being utilized to assist in the deposition of highly adherent or epitaxial layers. The increasing range of applications of ion implantation and ion assisted processing of materials has placed increasingly stringent demands on machine performance; in the present paper implantation techniques and their applications will be discussed. (author)

  5. Shallow nitrogen ion implantation: Evolution of chemical state and defect structure in titanium

    Energy Technology Data Exchange (ETDEWEB)

    Manojkumar, P.A., E-mail: manoj@igcar.gov.in [Indira Gandhi Centre for Atomic Research, Kalpakkam 603102 (India); Chirayath, V.A.; Balamurugan, A.K.; Krishna, Nanda Gopala; Ilango, S.; Kamruddin, M.; Amarendra, G.; Tyagi, A.K. [Indira Gandhi Centre for Atomic Research, Kalpakkam 603102 (India); Raj, Baldev [National Institute of Advanced Studies, Bangalore 560 012 (India)

    2016-09-15

    Highlights: • Low energy nitrogen ion implantation in titanium was studied. • Chemical and defect states were analyzed using SIMS, XPS and PAS. • SIMS and depth resolved XPS data showed good agreement. • Depth resolved defect and chemical states information were revealed. • Formation of 3 layers of defect states proposed to fit PAS results. - Abstract: Evolution of chemical states and defect structure in titanium during low energy nitrogen ion implantation by Plasma Immersion Ion Implantation (PIII) process is studied. The underlying process of chemical state evolution is investigated using secondary ion mass spectrometry and X-ray photoelectron spectroscopy. The implantation induced defect structure evolution as a function of dose is elucidated using variable energy positron annihilation Doppler broadening spectroscopy (PAS) and the results were corroborated with chemical state. Formation of 3 layers of defect state was modeled to fit PAS results.

  6. CHARACTERIZATION OF PRECIPITATES IN CUBIC SILICON CARBIDE IMPLANTED WITH 25Mg+ IONS

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Weilin; Spurgeon, Steven R.; Liu, Jia; Edwards, Danny J.; Schreiber, Daniel K.; Henager, Charles H.; Kurtz, Richard J.; Wang, Yongqiang

    2016-09-26

    The aim of this study is to characterize precipitates in Mg+ ion implanted and high-temperature annealed cubic silicon carbide using scanning transmission electron microscopy, electron energy loss spectroscopy and atom probe tomography.

  7. Using Ion Implantation to Fine-tune the Figure of Extremely Lightweight Mirrors

    Data.gov (United States)

    National Aeronautics and Space Administration — Ion implantation can change the mechanical and electrical properties of a material. It is a mature technology that has found many applications, both in industry and...

  8. Influence of plasma density and plasma sheath dynamics on the ion implantation by plasma immersion technique

    OpenAIRE

    Ensinger, Wolfgang

    1996-01-01

    Influence of plasma density and plasma sheath dynamics on the ion implantation by plasma immersion technique / B. Rauschenbach ... - In: Nuclear instruments and methods in physics research. B. 113. 1996. S. 266-269

  9. Modification of amorphous bright chromium deposited (ABCD) films by nitrogen ion implantation

    International Nuclear Information System (INIS)

    Ferber, H.; Hoflund, G.B.; Mount, C.K.; Hoshino, Shigeo

    1991-01-01

    The hardness of amorphous bright chromium deposited (ABCD) layers can be increased by annealing or N ion implantation. In this study the N ion implantation parameters which influence hardness have been systematically examined. These parameters include sample pretreatment, ion beam energy and total dose. The properties of the resulting films have been characterized using Auger electron spectroscopy coupled with ion sputtering depth profiling, X-ray photoelectron spectroscopy and Knoop microhardness measurements. Auger depth profiles suggest the formation of a stoichiometric CrN subsurface layer after implantation of high N doses (>8x10 17 N/cm 2 ). With higher doses this layer broadens toward the surface and N retention values decrease rapidly. Implanting at elevated temperatures increases the retained N, causes N to migrate more deeply into the bulk, and yields high hardness values. (orig.)

  10. Few Atomic Layered Lithium Cathode Materials to Achieve Ultrahigh Rate Capability in Lithium-Ion Batteries.

    Science.gov (United States)

    Tai, Zhixin; Subramaniyam, Chandrasekar M; Chou, Shu-Lei; Chen, Lingna; Liu, Hua-Kun; Dou, Shi-Xue

    2017-09-01

    The most promising cathode materials, including LiCoO 2 (layered), LiMn 2 O 4 (spinel), and LiFePO 4 (olivine), have been the focus of intense research to develop rechargeable lithium-ion batteries (LIBs) for portable electronic devices. Sluggish lithium diffusion, however, and unsatisfactory long-term cycling performance still limit the development of present LIBs for several applications, such as plug-in/hybrid electric vehicles. Motivated by the success of graphene and novel 2D materials with unique physical and chemical properties, herein, a simple shear-assisted mechanical exfoliation method to synthesize few-layered nanosheets of LiCoO 2 , LiMn 2 O 4 , and LiFePO 4 is used. Importantly, these as-prepared nanosheets with preferred orientations and optimized stable structures exhibit excellent C-rate capability and long-term cycling performance with much reduced volume expansion during cycling. In particular, the zero-strain insertion phenomenon could be achieved in 2-3 such layers of LiCoO 2 electrode materials, which could open up a new way to the further development of next-generation long-life and high-rate batteries. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  11. Operations manual for the plasma source ion implantation economics program

    International Nuclear Information System (INIS)

    Bibeault, M.L.; Thayer, G.R.

    1995-10-01

    Plasma Source Ion Implantation (PSII) is a surface modification technique for metal. PSIICOSTMODEL95 is an EXCEL-based program that estimates the cost for implementing a PSII system in a manufacturing setting where the number of parts to be processed is over 5,000 parts per day and the shape of each part does not change from day to day. Overall, the manufacturing process must be very well defined and should not change. This document is a self-contained manual for PSIICOSTMODEL95. It assumes the reader has some general knowledge of the technical requirements for PSII. Configuration of the PSII process versus design is used as the methodology in PSIICOSTMODEL95. The reason behind this is twofold. First, the design process cannot be programmed into a computer when the relationships between design variables are not understood. Second, the configuration methodology reduces the number of assumptions that must be programmed into our software. Misuse of results are less likely to occur if the user has fewer assumptions to understand

  12. Influence of ion implanted helium on deuterium trapping in Kh18N10T stainless steel

    International Nuclear Information System (INIS)

    Tolstolutskaya, G.D.; Ruzhitskij, V.V.; Kopanets, I.E.

    2004-01-01

    The results are presented on evolution of distribution profiles and helium and deuterium thermal desorption ion implanted in steel 18Cr10NiTi. Accumulation, trapping, retention and microstructure evolution are studied; effect helium and hydrogen simultaneous implantation on these processes is also studied

  13. Complementary vertical bipolar transistor process using high-energy ion implantation

    NARCIS (Netherlands)

    Ragay, F.W.; Ragay, F.W.; Aarnink, Antonius A.I.; Wallinga, Hans

    1991-01-01

    High-energy ion implantation is used as a key processing step in the formation of a complementary bipolar process with both transistor types being vertical. Both n-p-n and p -n-p transistors are made vertically with a deep implanted collector region. Combinations of epitaxial and buried layers are

  14. A review of recent developments in ion implantation for metallurgical application

    International Nuclear Information System (INIS)

    Hutchings, Ron

    1994-01-01

    Ion implantation emerged during the 1970s as a possible tool for improving the wear and corrosion resistance of metals and alloys. This emergence led to a period of intense activity in the early 1980s, aimed at identifying opportunities for the industrial application of ion implantation. This paper reviews the progress which has been made towards establishing ion implantation as an effective and reliable technique for improving the wear resistance of engineering materials. Particular emphasis is placed on the implantation of nitrogen. It is shown how detailed metallurgical studies have elucidated the role played by the implanted nitrogen in enhancing the resistance to wear of a broad range of alloys. These studies have highlighted the fact that the thin nature of the implanted layer has been a prime factor in restricting the industrial usage of ion implantation to a narrow range of specialized applications. This has resulted in a shift to the development of duplex treatments involving two-stage processes or, more recently, new techniques which allow simultaneous implantation and thermochemical treatment. The capabilities of, and future prospects for, such techniques are discussed. ((orig.))

  15. Study of high energy ion implantation of boron and oxygen in silicon

    International Nuclear Information System (INIS)

    Thevenin, P.

    1991-06-01

    Three aspects of high energy (0.5-3 MeV) light ions ( 11 B + and 16 O + ) implantation in silicon are examined: (1)Spatial repartition; (2) Target damage and (3) Synthesis by oxygen implantation of a buried silicon oxide layer

  16. Mechanical and structural properties of fluorine-ion-implanted boron suboxide

    CSIR Research Space (South Africa)

    Machaka, R

    2011-09-01

    Full Text Available is depicted in Figure 1(b) [15, 28]. 3.1.3. Raman Spectroscopy Analysis. Raman scattering spec- troscopy is very sensitive to the nature of crystalline struc- ture, disorder, and amorphization and is often employed to characterize ion...-implantation-induced defects and any irregularity in the crystalline symmetry. The rather popular technique offers a rapid, nondestructive, and simple diagnos- tic probe for the evaluation of the structural modifications imposed by ion implantation and for optical...

  17. Immobilization of extracellular matrix on polymeric materials by carbon-negative-ion implantation

    Science.gov (United States)

    Tsuji, Hiroshi; Sommani, Piyanuch; Muto, Takashi; Utagawa, Yoshiyuki; Sakai, Shun; Sato, Hiroko; Gotoh, Yasuhito; Ishikawa, Junzo

    2005-08-01

    Effects of ion implantation into polystyrene (PS), silicone rubber (SR) and poly-L-lactic acid (PLA) have been investigated for immobilization of extracellular matrix. Carbon negative ions were implanted into PS and SR sheets at various energies between 5-30 keV and various doses between 1.0 × 1014-1.0 × 1016 ions/cm2. Contact angles of pure water on C-implanted surfaces of PS and SR were decreased as increase in ion energy and in dose due to formation of functional groups such as OH and C-O. Selective attachment of nerve cells was observed on C-implanted them at 10 keV and 3 × 1015 ions/cm2 after in vitro cell culture of nerve cells of PC-12 h. Neurite outgrowth also extended over the implanted area. After dipping in a serum medium and in a fibronectin solution for 2 h, the detection of N 1s electrons by X-ray induced photoelectron spectroscopic (XPS) revealed a significant distinction of protein adhesion on the implanted area. Thus, immobilization of proteins on surface is used for considering the selective cell-attachment. For PLA, the selective attachment of cells and protein depended on the implantation conditions.

  18. Ultra-shallow junction formation by B18H22 ion implantation

    International Nuclear Information System (INIS)

    Kawasaki, Y.; Kuroi, T.; Yamashita, T.; Horita, K.; Hayashi, T.; Ishibashi, M.; Togawa, M.; Ohno, Y.; Yoneda, M.; Horsky, Tom; Jacobson, Dale; Krull, Wade

    2005-01-01

    We have investigated boron cluster implantation for ultra-shallow junction formation in transistors with gate lengths of ∼60nm. The use of large boron containing clusters is more advantageous than B + or BF 2 + implantation from the viewpoint of throughput and energy contamination. Ion implantation of B 18 H X + cluster ions, produced by ionizing B 18 H 22 (octadecaborane) vapor, was employed to fabricate the p-type SDE (source/drain extensions) of pMOSFETs. B 18 H X + implants with the energy and dose adjusted to produce equivalent projected range and B concentration as compared to conventional B + implants were carried out using a traditional implanter retrofitted with a SemEquip ClusterIon ( R) Source. The results on blank wafers and transistor performance on test pattern wafers were compared to standard monomer B + implants. Analysis of the blank wafers indicated that B 18 H X + showed the same or better characteristics than B + in junction depth and sheet resistance. Post-processing electrical measurements of the pMOSFETs implanted with B 18 H X + showed that they performed with nearly identical characteristics as ones implanted with B +

  19. Hardness depth profile of lattice strained cemented carbide modified by high-energy boron ion implantation

    Science.gov (United States)

    Yoshida, Y.; Matsumura, A.; Higeta, K.; Inoue, T.; Shimizu, S.; Motonami, Y.; Sato, M.; Sadahiro, T.; Fujii, K.

    1991-07-01

    The hardness depth profiles of cemented carbides which were implanted with high-energy B + ions have been estimated using a dynamic microhardness tester. The B + implantations into (16% Co)-cemented WC alloys were carried out under conditions where the implantation energies were 1-3 MeV and the fluences 1 × 10 17-1 × 10 18ions/cm 2. The profiles show that the implanted layer becomes harder as fluences are chosen at higher values and there is a peak at a certain depth which depends on the implantation energy. In X-ray diffraction (XRD) studies of the implanted surface the broadened refraction peaks of only WC and Co are detected and the increments of lattice strain and of residual stress in the near-surface region are observed. It is supposed that the hardening effect should be induced by an increase in residual stress produced by lattice strain. The hardness depth profile in successive implantation of ions with different energies agrees with the compounded profile of each one of the implantations. It is concluded that the hardness depth profile can be controlled under adequate conditions of implantation.

  20. Recent developments in the United Kingdom in ion implantation equipment for engineering components

    International Nuclear Information System (INIS)

    Gardner, P.R.

    1988-01-01

    Harwell has been particularly active in the development and commercial exploitation of low-cost, rugged, reliable and simple-to-operate equipment for implantation of engineering components with gaseous ions, especially nitrogen. Laboratory experiments show this to reduce mild abrasive wear in a wide range of materials by factors typically 2-10, provided operating temperatures remain below about 400 deg C. The latest nitrogen ion implantation machine (the Tecvac 221 model) embodies a substantial degree of flexibility, with cable-mounted ion sources and demountable target chambers. This enables wide ranges of workpiece size and shape to be accommodated. The latest development at Harwell is the large 'Blue Tank' ion implantation machine, currently the biggest in the world. This can treat workpieces up to 2 metres maximum dimension and 1 tonne weight using a bucket-type ion source capable of generating 35 mA of nitrogen ion beam current over an 800 mm diameter treatment area. This machine enables increased flexibility and reduced unit treatment costs for nitrogen ion implantation. Uptake of nitrogen ion implantation in British industry is increasing steadily. Key market sectors include the plastics processing industry (for extrusion screws, moulds and dies), as well as many other engineering sectors. A useful accessory to ion implantation developed at Harwell in conjunction with Millspin Limited, monitors nitrogen ion dose colour changes in anodised tantalum which can be compared against a calibrated standard. Accuracies of around 20 % at 2.5 x 10 17 nitrogen ions.cm -2 dose are achievable. (J.P.N.)

  1. Surface potential measurement of insulators in negative-ion implantation by secondary electron energy-peak shift

    International Nuclear Information System (INIS)

    Nagumo, Shoji; Toyota, Yoshitaka; Tsuji, Hiroshi; Gotoh, Yasuhito; Ishikawa, Junzo; Sakai, Shigeki; Tanjyo, Masayasu; Matsuda, Kohji.

    1993-01-01

    Negative-ion implantation is expected to realize charge-up free implantation. In this article, about a way to specify surface potential of negative-ion implanted insulator by secondary-electron-energy distribution, its principle and preliminary experimental results are described. By a measuring system with retarding field type energy analyzer, energy distribution of secondary electron from insulator of Fused Quartz in negative-carbon-ion implantation was measured. As a result the peak-shift of its energy distribution resulted according with the surface potential of insulator. It was found that surface potential of insulator is negatively charged by only several volts. Thus, negative-ion implanted insulator reduced its surface charge-up potential (without any electron supply). Therefore negative-ion implantation is considered to be much more effective method than conventional positive-ion implantation. (author)

  2. Sources and transport systems for low energy extreme of ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Hershcovitch, A.; Batalin, V.A.; Bugaev, A.S.; Gushenets, V.I.; Alexeyenko, O.; Gurkova, E.; Johnson, B.M.; Kolomiets, A.A.; Kropachev, G.N.; Kuibeda, R.P.; Kulevoy, T.V.; Masunov, E.S.; Oks, E.M.; Pershin, V.I.; Polozov, S.M.; Poole, H.J.; Seleznev, D.N.; Storozhenko, P.A.; Vizir, A.; Svarovski, A.Ya.; Yakushin, P.; Yushkov, G.Yu.

    2010-06-06

    For the past seven years a joint research and development effort focusing on the design of steady state, intense ion sources has been in progress with the ultimate goal being to meet the two, energy extreme range needs of mega-electron-volt and 100's of electron-volt ion implanters. However, since the last Fortier is low energy ion implantation, focus of the endeavor has shifted to low energy ion implantation. For boron cluster source development, we started with molecular ions of decaborane (B{sub 10}H{sub 14}), octadecaborane (B{sub 18}H{sub 22}), and presently our focus is on carborane (C{sub 2}B{sub 10}H{sub 12}) ions developing methods for mitigating graphite deposition. Simultaneously, we are developing a pure boron ion source (without a working gas) that can form the basis for a novel, more efficient, plasma immersion source. Our Calutron-Berna ion source was converted into a universal source capable of switching between generating molecular phosphorous P{sub 4}{sup +}, high charge state ions, as well as other types of ions. Additionally, we have developed transport systems capable of transporting a very large variety of ion species, and simulations of a novel gasless/plasmaless ion beam deceleration method were also performed.

  3. Optical stability under photo-irradiation of urushi films by ion implantation

    International Nuclear Information System (INIS)

    Awazu, Kaoru; Funada, Yoshinori; Kasamori, Masato; Sakamoto, Makoto; Ichikawa, Tachio

    1995-01-01

    Nitrogen ions, argon ions and others were implanted in urushi-coated surfaces by using a simplified ion implantation apparatus, and the optical stability test was carried out by a sunshine weather meter. The rate of remaining luster on urushi-coated surfaces accompanying ultraviolet irradiation showed respective peculiar behavior according to the kinds of the implanted ions, the time of implantation, transparent and black urushi films, and the use of brightener or not. In electron beam irradiation, change hardly occurred. In urushi-coated products, the luster and the properties are maintained for long period, therefore recently, urushi coating has become to be applied to road sign panels and notice boards in addition to lacquer wares and applied fine art products, and the improvement of the optical stability of urushi films has become the subject. In this study, the experimental methods on urushi coating, ion implantation, the optical stability test and measuring method are explained. The changes of urushi film luster, transmittance, haze, lightness, and chromaticity by nitrogen ion implantation are reported. (K.I.)

  4. Effect of implanted species on thermal evolution of ion-induced defects in ZnO

    International Nuclear Information System (INIS)

    Azarov, A. Yu.; Rauwel, P.; Kuznetsov, A. Yu.; Svensson, B. G.; Hallén, A.; Du, X. L.

    2014-01-01

    Implanted atoms can affect the evolution of ion-induced defects in radiation hard materials exhibiting a high dynamic annealing and these processes are poorly understood. Here, we study the thermal evolution of structural defects in wurtzite ZnO samples implanted at room temperature with a wide range of ion species (from 11 B to 209 Bi) to ion doses up to 2 × 10 16  cm −2 . The structural disorder was characterized by a combination of Rutherford backscattering spectrometry, nuclear reaction analysis, and transmission electron microscopy, while secondary ion mass spectrometry was used to monitor the behavior of both the implanted elements and residual impurities, such as Li. The results show that the damage formation and its thermal evolution strongly depend on the ion species. In particular, for F implanted samples, a strong out-diffusion of the implanted ions results in an efficient crystal recovery already at 600 °C, while co-implantation with B (via BF 2 ) ions suppresses both the F out-diffusion and the lattice recovery at such low temperatures. The damage produced by heavy ions (such as Cd, Au, and Bi) exhibits a two-stage annealing behavior where efficient removal of point defects and small defect clusters occurs at temperatures ∼500 °C, while the second stage is characterized by a gradual and partial annealing of extended defects. These defects can persist even after treatment at 900 °C. In contrast, the defects produced by light and medium mass ions (O, B, and Zn) exhibit a more gradual annealing with increasing temperature without distinct stages. In addition, effects of the implanted species may lead to a nontrivial defect evolution during the annealing, with N, Ag, and Er as prime examples. In general, the obtained results are interpreted in terms of formation of different dopant-defect complexes and their thermal stability

  5. Effect of implanted species on thermal evolution of ion-induced defects in ZnO

    Science.gov (United States)

    Azarov, A. Yu.; Hallén, A.; Du, X. L.; Rauwel, P.; Kuznetsov, A. Yu.; Svensson, B. G.

    2014-02-01

    Implanted atoms can affect the evolution of ion-induced defects in radiation hard materials exhibiting a high dynamic annealing and these processes are poorly understood. Here, we study the thermal evolution of structural defects in wurtzite ZnO samples implanted at room temperature with a wide range of ion species (from 11B to 209Bi) to ion doses up to 2 × 1016 cm-2. The structural disorder was characterized by a combination of Rutherford backscattering spectrometry, nuclear reaction analysis, and transmission electron microscopy, while secondary ion mass spectrometry was used to monitor the behavior of both the implanted elements and residual impurities, such as Li. The results show that the damage formation and its thermal evolution strongly depend on the ion species. In particular, for F implanted samples, a strong out-diffusion of the implanted ions results in an efficient crystal recovery already at 600 °C, while co-implantation with B (via BF2) ions suppresses both the F out-diffusion and the lattice recovery at such low temperatures. The damage produced by heavy ions (such as Cd, Au, and Bi) exhibits a two-stage annealing behavior where efficient removal of point defects and small defect clusters occurs at temperatures ˜500 °C, while the second stage is characterized by a gradual and partial annealing of extended defects. These defects can persist even after treatment at 900 °C. In contrast, the defects produced by light and medium mass ions (O, B, and Zn) exhibit a more gradual annealing with increasing temperature without distinct stages. In addition, effects of the implanted species may lead to a nontrivial defect evolution during the annealing, with N, Ag, and Er as prime examples. In general, the obtained results are interpreted in terms of formation of different dopant-defect complexes and their thermal stability.

  6. High energy metal ion implantation using 'Magis', a novel, broad-beam, Marx-generator-based ion source

    International Nuclear Information System (INIS)

    Anders, A.; Brown, I.G.; Dickinson, M.R.; MacGill, R.A.

    1996-08-01

    Ion energy of the beam formed by an ion source is proportional to extractor voltage and ion charge state. Increasing the voltage is difficult and costly for extraction voltage over 100 kV. Here we explore the possibility of increasing the charge states of metal ions to facilitate high-energy, broad beam ion implantation at a moderate voltage level. Strategies to enhance the ion charge state include operating in the regimes of high-current vacuum sparks and short pulses. Using a time-of-flight technique we have measured charge states as high as 7+ (73 kA vacuum spark discharge) and 4+ (14 kA short pulse arc discharge), both for copper, with the mean ion charge states about 6.0 and 2.5, respectively. Pulsed discharges can conveniently be driven by a modified Marx generator, allowing operation of ''Magis'' with a single power supply (at ground potential) for both plasma production and ion extraction

  7. Surface changes of nanotopography by carbon ion implantation to enhance the biocompatibility of silicone rubber: an in vitro study of the optimum ion fluence and adsorbed protein.

    Science.gov (United States)

    Li, Xianhui; Zhou, Xin; Chen, Yao; Yu, Shu; Chen, Xin; Xia, Xin; Shi, Xiaohua; Zhang, Yiming; Fan, Dongli

    2017-09-15

    Lower cellular adhesion and dense fibrous capsule formation around silicone breast implants caused by lower biocompatibility is a serious clinical problem. Preliminary work has shown that ion implantation enhances cell adhesion. Whether the biocompatibility is further enhanced by higher doses of carbon ion implantation and the mechanism by which ion implantation enhances biocompatibility remain unclear. In this study, five doses of carbon ions, which gradually increase, were implanted on the surface of silicone rubber and then the surface characteristics were surveyed. Then, cell adhesion, proliferation and migration were investigated. Furthermore, the vitronectin (VN) protein was used as a model protein to investigate whether the ion implantation affected the adsorbed protein on the surface. The obtained results indicate that enhanced cytocompatibility is dose dependent when the doses of ion implantation are less than 1 × 10 16  ions/cm 2 . However, when the doses of ion implantation are more than 1 × 10 16  ions/cm 2 , enhanced cytocompatibility is not significant. In addition, surface physicochemical changes by ion implantation induced a conformational change of the adsorbed vitronectin protein that enhanced cytocompatibility. Together, these results suggest that the optimum value of carbon ion implantation in silicone rubber to enhance biocompatibility is 1 × 10 16  ions/cm 2 , and ion implantation regulates conformational changes of adsorbed ECM proteins, such as VN, and mediates the expression of intracellular signals that enhance the biocompatibility of silicone rubber. The results herein provide new insights into the surface modification of implant polymer materials to enhance biocompatibility. It has potentially broad applications in the biomedical field.

  8. Modulation of the sound press level by the treatment of polymer diaphragms through ion implantation method

    International Nuclear Information System (INIS)

    Yeo, Sunmog; Park, Jaewon; Lee, Hojae

    2010-01-01

    We present two different surface modification treatments, an ion implantation, and an ion beam mixing, and show that the surface modifications caused by these treatments are useful tools to modulate the sound press level. The ion implantations on various polymer diaphragms cause an increase in the resonant frequency so that the sound press level is lowered at low frequencies. On the contrary, a Cu or Fe 2 O 3 coating by using an ion beam mixing method causes a decrease in the resonant frequency, resulting in a high sound press level at low frequencies. We discuss the physical reasons for the change in the sound press level due to the ion-implantation methods.

  9. Annealing effects on the migration of ion-implanted cadmium in glassy carbon

    Energy Technology Data Exchange (ETDEWEB)

    Hlatshwayo, T.T., E-mail: thulani.hlatshwayo@up.ac.za [Physics Department, University of Pretoria, Pretoria (South Africa); Sebitla, L.D. [Physics Department, University of Pretoria, Pretoria (South Africa); Physics Department, University of Botswana, Gaborone (Botswana); Njoroge, E.G.; Mlambo, M.; Malherbe, J.B. [Physics Department, University of Pretoria, Pretoria (South Africa)

    2017-03-15

    The migration behaviour of cadmium (Cd) implanted into glassy carbon and the effects of annealing on radiation damage introduced by ion implantation were investigated. The glassy carbon substrates were implanted with Cd at a dose of 2 × 10{sup 16} ions/cm{sup 2} and energy of 360 keV. The implantation was performed at room temperature (RT), 430 °C and 600 °C. The RT implanted samples were isochronally annealed in vacuum at 350, 500 and 600 °C for 1 h and isothermally annealed at 350 °C up to 4 h. The as-implanted and annealed samples were characterized by Raman spectroscopy and Rutherford backscattering spectrometry (RBS). Raman results revealed that implantation at room temperature amorphized the glassy carbon structure while high temperature implantations resulted in slightly less radiation damage. Isochronal annealing of the RT implanted samples resulted in some recrystallization as a function of increasing temperature. The original glassy carbon structure was not achieved at the highest annealing temperature of 600 °C. Diffusion of Cd in glassy carbon was already taking place during implantation at 430 °C. This diffusion of Cd was accompanied by significant loss from the surface during implantation at 600 °C. Isochronal annealing of the room temperature implanted samples at 350 °C for 1 h caused Cd to diffuse towards the bulk while isothermal annealing at 500 and 600 °C resulted in the migration of implanted Cd toward the surface accompanied by a loss of Cd from the surface. Isothermal annealing at 350 °C for 1 h caused Cd to diffuse towards the bulk while for annealing time >1 h Cd diffused towards the surface. These results were interpreted in terms of trapping and de-trapping of implanted Cd by radiation damage.

  10. Development and experimental study of large size composite plasma immersion ion implantation device

    Science.gov (United States)

    Falun, SONG; Fei, LI; Mingdong, ZHU; Langping, WANG; Beizhen, ZHANG; Haitao, GONG; Yanqing, GAN; Xiao, JIN

    2018-01-01

    Plasma immersion ion implantation (PIII) overcomes the direct exposure limit of traditional beam-line ion implantation, and is suitable for the treatment of complex work-piece with large size. PIII technology is often used for surface modification of metal, plastics and ceramics. Based on the requirement of surface modification of large size insulating material, a composite full-directional PIII device based on RF plasma source and metal plasma source is developed in this paper. This device can not only realize gas ion implantation, but also can realize metal ion implantation, and can also realize gas ion mixing with metal ions injection. This device has two metal plasma sources and each metal source contains three cathodes. Under the condition of keeping the vacuum unchanged, the cathode can be switched freely. The volume of the vacuum chamber is about 0.94 m3, and maximum vacuum degree is about 5 × 10‑4 Pa. The density of RF plasma in homogeneous region is about 109 cm‑3, and plasma density in the ion implantation region is about 1010 cm‑3. This device can be used for large-size sample material PIII treatment, the maximum size of the sample diameter up to 400 mm. The experimental results show that the plasma discharge in the device is stable and can run for a long time. It is suitable for surface treatment of insulating materials.

  11. Dislocation structures and strengthening of ion-implanted metals and alloys

    Science.gov (United States)

    Sharkeev, Yu. P.; Didenko, A. N.; Kozlov, É. V.

    1994-05-01

    This article surveys the empirical data on the “long-range effect” (changes in defect structure and physicomechanical properties at distances considerably exceeding the mean free path of ions) seen in the ion implantation of metallic materials and semiconductors. Results are presented from electron-microscope studies of dislocation structures formed in ion-implanted metallic materials which are initially in different states. It is shown that the character of the dislocation structure and its quantitative characteristics in ion-implanted metals and alloys depend on the initial state of the target, the species and energy of the ions, and the radiation dose. Data obtained on the change in microstructure with depth is combined with data from other authors and correlated with the results of a study of macroscopic characteristics (wear resistance, microhardness). It is established that the “long-range effect” is seen in metallic materials which, in addition to having a low yield point or a high degree of plastic strain, also have a low dislocation density prior to ion implantation. Mechanisms by which the defect structure might be modified by ion implantation are explored.

  12. Generation of Nitrogen-Vacancy Centers in Diamond with Ion Implantation

    Science.gov (United States)

    Cui, Jin-Ming; Chen, Xiang-Dong; Fan, Le-Le; Gong, Zhao-Jun; Zou, Chong-Wen; Sun, Fang-Wen; Han, Zheng-Fu; Guo, Guang-Can

    2012-03-01

    Nitrogen-vacancy defect color centers are created in a high purity single crystal diamond by nitrogen-ion implantation. Both optical spectrum and optically detected magnetic resonance are measured for these artificial quantum emitters. Moreover, with a suitable mask, a lattice composed of nitrogen-vacancy centers is fabricated. Rabi oscillation driven by micro-waves is carried out to show the quality of the ion implantation and potential in quantum manipulation. Along with compatible standard lithography, such an implantation technique shows high potential in future to make structures with nitrogen-vacancy centers for diamond photonics and integrated photonic quantum chip.

  13. Generation of Nitrogen-Vacancy Centers in Diamond with Ion Implantation

    International Nuclear Information System (INIS)

    Cui Jin-Ming; Chen Xiang-Dong; Gong Zhao-Jun; Sun Fang-Wen; Han Zheng-Fu; Guo Guang-Can; Fan Le-Le; Zou Chong-Wen

    2012-01-01

    Nitrogen-vacancy defect color centers are created in a high purity single crystal diamond by nitrogen-ion implantation. Both optical spectrum and optically detected magnetic resonance are measured for these artificial quantum emitters. Moreover, with a suitable mask, a lattice composed of nitrogen-vacancy centers is fabricated. Rabi oscillation driven by micro-waves is carried out to show the quality of the ion implantation and potential in quantum manipulation. Along with compatible standard lithography, such an implantation technique shows high potential in future to make structures with nitrogen-vacancy centers for diamond photonics and integrated photonic quantum chip

  14. Transition metal swift heavy ion implantation on 4H-SiC

    Energy Technology Data Exchange (ETDEWEB)

    Ali, A. Ashraf; Kumar, J. [Crystal Growth Centre, Anna University, Chennai 600 025 (India); Ramakrishnan, V. [Indian Institute of Science Education and Research, Thiruvanthapuram (India); Asokan, K. [Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110 067 (India)

    2016-03-01

    This work reports on the realization of Quantum Ring (QR) and Quantum Dot (QD) like structures on 4H-SiC through SHI implantation and on their Raman studies. 4H-SiC is SHI implanted with Transition Metal (TM) Ni ion at different fluences. It is observed that a vibrational mode emerges as the result of Ni ion implantation. The E{sub 2} (TO) and the A{sub 1} (LO) are suppressed as the fluence increases. In this paper Raman and AFM studies have been performed at room temperature and the queer anomalies are addressed so new devices can be fabricated.

  15. Transition metal swift heavy ion implantation on 4H-SiC

    Science.gov (United States)

    Ali, A. Ashraf; Kumar, J.; Ramakrishnan, V.; Asokan, K.

    2016-03-01

    This work reports on the realization of Quantum Ring (QR) and Quantum Dot (QD) like structures on 4H-SiC through SHI implantation and on their Raman studies. 4H-SiC is SHI implanted with Transition Metal (TM) Ni ion at different fluences. It is observed that a vibrational mode emerges as the result of Ni ion implantation. The E2 (TO) and the A1 (LO) are suppressed as the fluence increases. In this paper Raman and AFM studies have been performed at room temperature and the queer anomalies are addressed so new devices can be fabricated.

  16. Planar self-aligned ion implanted InP MISFETS for fast logic applications

    International Nuclear Information System (INIS)

    Cameron, D.C.; Irving, L.D.; Whitehouse, C.R.; Woodward, J.; Lee, D.

    1983-01-01

    The first successful use of ion implantation to fabricate truly self-aligned planar n-channel enhancement-mode indium phosphide MISFITS is reported. The transistors have been fabricated on iron-doped semi-insulating material using PECVD-deposited SiO 2 as the gate dielectric and molybdenum gate electrodes. The self-aligned source and drain contact regions were produced by Si 29 ion implantation using each gate stripe as an implant mask. The devices fabricated to date have exhibited channel mobilities up to value of 2400 cm 2 v -1 s -1 , with excellent uniformity and stability of the device characteristics also being observed. (author)

  17. Comparison of proton and phosphorous ion implantation-induced intermixing of InAs/InP quantum dots

    International Nuclear Information System (INIS)

    Barik, S; Tan, H H; Jagadish, C

    2007-01-01

    We report and compare proton and phosphorous ion implantation-induced intermixing of InAs/InP quantum dots (QDs). After ion implantation at 20-300 deg. C, the QDs are rapid thermally annealed at 850 deg. C for 30 s. Proton implantation induces less energy shift than P ion implantation for a given concentration of atomic displacements due to the more efficient dynamic annealing of the defects created by protons. The implantation-induced energy shift reaches a maximum value of about 260 meV for a dose of 5 x 10 12 ions cm -2 in the P ion implanted QDs, which also show narrower PL linewidths compared to the proton implanted QDs. We also report the effects of an InGaAs top cap layer on the ion implantation-induced QD intermixing and show that defect production and annihilation processes evolve differently in InGaAs and InP layers and vary with the implantation temperature. When the implantation is performed at higher temperatures, the energy shift of the P ion implanted QDs capped with an InP layer increases due to the reduction in larger defect cluster formation at higher temperatures, while the energy shift of the proton implanted QDs decreases due to increased dynamic annealing irrespective of their cap layers

  18. Formation of shallow junctions for VLSI by ion implantation and rapid thermal annealing

    International Nuclear Information System (INIS)

    Oeztuerk, M.C.

    1988-01-01

    In this work, several techniques were studied to form shallow junctions in silicon by ion implantation. These include ion implantation through thin layers of silicon dioxide and ion implantation through a thick polycrystalline silicon layer. These techniques can be used to reduce the junction depth. Their main disadvantage is dopant loss in the surface layer. As an alternative, preamorphization of the Si substrate prior to boron implantation to reduce boron channeling was investigated. The disadvantage of preamorphization is the radiation damage introduced into the Si substrate using the implant. Preamorphization by silicon self-implantation has been studied before. The goal of this study was to test Ge as an alternative amorphizing agent. It was found that good-quality p + -n junctions can be formed by both boron and BF 2 ion implantation into Ge-preamorphized Si provided that the preamorphization conditions are optimized. If the amorphous crystalline interface is sufficiently close to the surface, it is possible to completely remove the end-of-range damage. If these defects are not removed and are left in the depletion region, they can result in poor-quality, leaky junctions

  19. Ion implantation by isotope separator on line (ISOL) of indium isotopes

    International Nuclear Information System (INIS)

    Hanada, Reimon; Murayama, Mitsuhiro; Saito, Shigeru; Nagata, Shinji; Yamaguchi, Sadaei; Shinozuka, Tsutomu; Fujioka, Manabu.

    1994-01-01

    111 In has been known as the nuclide which is most suitable to perturbed angular correlation (PAC) process, as the life of its intermediate state is long , the half life is proper in view of the measurement and radiation control, and it is easily available as its chloride is on the market. In the PAC, it is necessary to introduce this probe nuclei into samples. The most simple method is diffusion process, but in the materials, of which the solid-solubility of In is low like Fe and Si, the introduction is very difficult, therefore, it is necessary to do ion implantation. The development of this process was tried, and the results are reported. For the experiment, the ISOL in the cyclotron RI center, Tohoku University, was used as the accelerator for the implantation. The experimental method is explained. As the results, in the case of nonradioactive In implantation, the Ruthereford back scattering (RBS) spectra of the Si in which In was implanted, the spectra when the channeling condition was satisfied, and the results of measuring the angle dependence of channeling for In and In-implanted Si are shown. In the case of the ion implantation of radioactive 111 In, the energy spectra of In-implanted Si, the PAC spectra of In-implanted Si samples, and the PAC spectra for pure iron and Fe-Si alloy are shown. The further improvement of the ion sources is necessary. (K.I.)

  20. Study and realisation of plane optical waveguides in amorphous silica by ion implantation

    International Nuclear Information System (INIS)

    Moutonnet, Danielle

    1974-01-01

    Within the framework of the replacement of radio-electric waves by light waves as support of information transmission in telecommunications, this research thesis addresses the use of ion implantation for the development of small waveguides with low losses. The author first describes how such waveguides can be characterised by studying the propagation of an electromagnetic wave in a plane waveguide, and the different ways to introduce energy in these waveguides. Then, she discusses how the obtained results can be used to determine the main parameters of an optical waveguide, or more generally of a thin transparent layer for a chosen wavelength. In the second part, the author reports the application of this general method to the case of guides obtained by ion implantation. She notably identifies the possibilities of ion implantation as technological tool to develop waveguides, and discusses how the performed experiments allow a better understanding of physical mechanisms occurring during implantation. In this second part, she recalls generally admitted theories about ion implantation, describes experiment principles (implantation of oxygen or nitrogen ions into amorphous silica followed by annealing) and discusses the obtained results (increase of the refraction index, i.e. of the guiding effect, stronger for oxygen than for nitrogen) [fr

  1. Application of micro beam PIXE to detection of titanium ion release from dental and orthopaedic implants

    International Nuclear Information System (INIS)

    Ektessabi, A.M.; Otsuka, T.; Tsuboi, Y.; Yokoyama, K.; Albrektsson, T.; Sennerby, L.; Johansson, C.

    1994-01-01

    In the past two decades the utilization of dental and orthopaedic implants in reconstructive surgery has been spread widely. Most of these implants are inserted in the corrosive environment of the human body for long periods of time. The level of dissolution, release, and transport of metal ions as a result of corrosion of these materials are not fully known at present. We report the results of application of micro ion beam PIXE spectroscopy to detect release of titanium from titanium and titanium alloy implants inserted in the tibiae of rabbits for three months. It was found that titanium ions could be detected in the surrounding tissues, with high precision, as a gradient from the implant surface and in higher amounts in the bone tissue as compared with the soft tissues. It is concluded that application of micro ion beam PIXE spectroscopy for detection of metal ion release, and distribution of the released material around the implants with high special resolution and accuracy may be used to further investigate the mechanism of metal release, and the relation between surface micromorphology and corrosion resistance of the implant materials. (author)

  2. Deep ion implantation for bipolar silicon devices; investigations into the use of the third dimension

    International Nuclear Information System (INIS)

    Mouthaan, A.J.

    1986-01-01

    This thesis covers various aspects of the use of deep ion implantations in digital bipolar circuits. It starts with the implications of the use of deep ion implantations for numerical process, device and circuit simulation. It shows the use of 1MeV boron and phosphorus implantations in the realization of a fully vertical IIL, here named Buried Injector Logic, which can also be used as static and dynamic memory device in several different configurations. The author presents a combined MOS-bipolar device, called the Charge Injection Device as a dynamic memory cell. Finally, deep ion implantations are used to realize a stack of photovoltaic cells that produces a multiple of the open circuit voltage of one photodiode. (Auth.)

  3. Defects and defect generation in oxide layer of ion implanted silicon-silicon dioxide structures

    CERN Document Server

    Baraban, A P

    2002-01-01

    One studies mechanism of generation of defects in Si-SiO sub 2 structure oxide layer as a result of implantation of argon ions with 130 keV energy and 10 sup 1 sup 3 - 3.2 x 10 sup 1 sup 7 cm sup - sup 2 doses. Si-SiO sub 2 structures are produced by thermal oxidation of silicon under 950 deg C temperature. Investigations were based on electroluminescence technique and on measuring of high-frequency volt-farad characteristics. Increase of implantation dose was determined to result in spreading of luminosity centres and in its maximum shifting closer to boundary with silicon. Ion implantation was shown, as well, to result in increase of density of surface states at Si-SiO sub 2 interface. One proposed model of defect generation resulting from Ar ion implantation into Si-SiO sub 2

  4. In situ EELS and TEM observation of Al implanted with nitrogen ions

    International Nuclear Information System (INIS)

    Hojou, K.; Furuno, S.; Kushita, K.N.; Otsu, H.; Izui, K.

    1995-01-01

    Formation processes of Aluminum nitride (AIN) in Aluminum (AI) implanted with nitrogen were examined by in situ EELS and TEM observations during nitrogen ion implantation in an electron microscope at room temperature and 400 deg C. AIN phase was identified both by EDP and EELS after nitrogen ion implantation to 6 x 10 20 (N + )/m 2 . The observed peak (20.8 eV) in EELS spectra was identified as plasmon loss peak of AIN formed in AI. The binding energy of N ls in AI was found to shift by about 4 eV to the lower side with increasing nitrogen-ion fluence. Unreacted AI was also found to remain in the AIN films after high fluence implantation both at room temperature and 400 deg C. (authors). 11 refs., 5 figs., 2 tabs

  5. Physical property of disordered-GaAs produced by ion implantation

    International Nuclear Information System (INIS)

    Nojima, Shunji

    1979-01-01

    The properties of disordered-GaAs produced by ion implantation and its annealing behaviors are investigated for ion species of H, Be, P, and As, from the viewpoints of both the electrical property and the physical structure of the disordered layer. From the study of the electron diffraction for implanted layers and of the conductivity due to defects as a function of dose, depth, measuring temperature, and annealing temperature, the following two facts are clarified: first, the conductivity due to defects can be a good measure for the degree of disorder in GaAs produced by ion implantation, when it is less than --1 Ω -1 cm -1 . Second, the localized states originating from defects are distributed with the same density in the high dose implanted layer, in spite of the degree of disorder in the physical structure. (author)

  6. Production of amorphous metal layers using ion implantation and investigation of the related modification of some surface properties

    International Nuclear Information System (INIS)

    Hoang Dac Luc; Vu Hoang Lam.

    1993-01-01

    Amorphous layers were produced by implanting B + ions into Al at 50 keV. The modification of the electrochemical corrosion resistance and the mechanical strength of implanted specimen was investigated. (author). 2 refs, 1 tab, 2 figs

  7. Mixing of phosphorus and antimony ions in silicon by recoil implantation

    International Nuclear Information System (INIS)

    Kwok, H.L.; Lam, Y.W.; Wong, S.P.; Poon, M.C.

    1986-01-01

    The effects of mixing phosphorus and antimony ions in silicon by recoil implantation were examined. The electrical properties after ion mixing were investigated, and the results were compared with those obtained using other techniques. Different degrees of activation were also studied, by investigating the annealing behaviour. (U.K.)

  8. Ion implantation to improve mechanical and electrical properties of resistive materials based on ruthenium dioxide

    International Nuclear Information System (INIS)

    Byeli, A.V.; Shykh, S.K.; Beresina, V.P.

    1996-01-01

    This paper reports the influence of ion implantation, using different chemical species, on the surface micromorphology, wear resistance, coefficient of friction and electrical resistivity, and its variation during friction for resistive materials based on ruthenium dioxide. It is demonstrated that nitrogen and hydrogen ions are the most effective for modifying surface properties. (Author)

  9. Secondary ion mass spectrometry characterization of indium-implanted silicon wafers

    Science.gov (United States)

    Blackmer-Krasinski, C.; Morinville, W. R.

    2004-06-01

    Indium is a key element in the formation of well, channel, and halo profiles in semiconductor fabrication. Indium has the advantage of being a large atom with a small projected range, creating a steeper implant profile than the boron implant used in the past [Proceedings of the 14th International Conference on Ion Implantation Technology, ITT, 2002]. Typically, secondary ion mass spectrometry (SIMS) is used to provide implant profiles; however, when a set of indium-implanted samples were analyzed on the Cameca IMS-6F, non-repeatability of the implant profile was observed in the samples that had not received an oxide spacer prior to implantation. This non-repeatability was not observed when the same samples were analyzed on the Perkin-Elmer 6300 quadrupole secondary ion mass spectrometer. Several reasons for this were hypothesized: (1) an amorphous layer was being created due to the large size of the indium atom; (2) increased damage and surface roughening occurred on the samples that did not receive an oxide layer prior to implantation; (3) Gibbsian segregation similar to that of Cu in SiO 2 was being observed [Secondary Ion Mass Spectrometry, Wiley, New York, 1989, p. 2.2-1]; and (4) sample heating was changing the thermodynamic properties of the samples. To explore these possibilities, two sets of indium-implanted samples—with and without spacer oxide—were analyzed with atomic force microscopy (AFM) for surface roughness and with transmission electron microscopy (TEM) for differences in amorphization. SIMS analysis was also conducted on both types of dynamic SIMS instruments to develop an analytical protocol for determining the indium implant profile. Repeatable results, consistent with analysis on the quadrupole SIMS, were obtained by utilizing the cold finger on the Cameca 6F.

  10. Synergistic effect of nanotopography and bioactive ions on peri-implant bone response

    Directory of Open Access Journals (Sweden)

    Su Y

    2017-01-01

    Full Text Available Yingmin Su,1 Satoshi Komasa,1 Peiqi Li,2 Mariko Nishizaki,1 Luyuan Chen,1 Chisato Terada,1 Shigeki Yoshimine,1 Hiroshi Nishizaki,1 Joji Okazaki1 1Department of Removable Prosthodontics and Occlusion, 2Department of Oral Implantology, Osaka Dental University, Hirakata, Osaka, Japan Abstract: Both bioactive ion chemistry and nanoscale surface modifications are beneficial for enhanced osseointegration of endosseous implants. In this study, a facile synthesis approach to the incorporation of bioactive Ca2+ ions into the interlayers of nanoporous structures (Ca-nano formed on a Ti6Al4V alloy surface was developed by sequential chemical and heat treatments. Samples with a machined surface and an Na+ ion-incorporated nanoporous surface (Na-nano fabricated by concentrated alkali and heat treatment were used in parallel for comparison. The bone response was investigated by microcomputed tomography assessment, sequential fluorescent labeling analysis, and histological and histomorphometric evaluation after 8 weeks of implantation in rat femurs. No significant differences were found in the nanotopography, surface roughness, or crystalline properties of the Ca-nano and Na-nano surfaces. Bone–implant contact was better in the Ca-nano and Na-nano implants than in the machined implant. The Ca-nano implant was superior to the Na-nano implant in terms of enhancing the volume of new bone formation. The bone formation activity consistently increased for the Ca-nano implant but ceased for the Na-nano implant in the late healing stage. These results suggest that Ca-nano implants have promising potential for application in dentistry and orthopedics. Keywords: surface modification, nanotopography, bioactive ion, osteoinduction, osseointegration

  11. Sliding wear characteristics of carburized steels and thermally refined steels implanted with nitrogen ions

    International Nuclear Information System (INIS)

    Terashima, Keiichi; Koda, Hiroyuki; Takeuchi, Eiichi.

    1995-01-01

    In order to concretely examine the application of surface reforming by ion implantation, nitrogen ion implantation was applied to the thermally refined steels S45C and SCM440 and the carburized steel SCM415, which are high versatile steels for mechanical structures, and their friction and wear characteristics were examined. The results are summarized as follows. In the surface-reformed material, in which nitrogen was implanted for the purpose of improving the seizure durability of the carburized steel, the load-frictional coefficient curve in lubricated sliding friction was similar to that of the material without implantation, but it was recognized that the load at which seizure occurred reached 2000 kgf or more, and as the amount of implantation was more, the material withstood higher load. In the lubricated sliding friction using a pin-ring type wear testing machine of the thermally refined steels and those to which implantation was applied, it was recognized that the specific wear amount was less in the implanted steels than in those without implantation. The results of the analysis of the implanted surface layers and the friction surfaces are reported. (K.I.)

  12. Synergistic effects of iodine and silver ions co-implanted in 6H-SiC

    Science.gov (United States)

    Kuhudzai, R. J.; Malherbe, J. B.; Hlatshwayo, T. T.; van der Berg, N. G.; Devaraj, A.; Zhu, Z.; Nandasiri, M.

    2015-12-01

    Motivated by the aim of understanding the release of fission products through the SiC coating of fuel kernels in modern high temperature nuclear reactors, a fundamental investigation is conducted to understand the synergistic effects of implanted silver (Ag) and iodine (I) in 6H-SiC. The implantation of the individual species, as well as the co-implantation of 360 keV ions of I and Ag at room temperature in 6H-SiC and their subsequent annealing behaviour has been investigated by Secondary Ion Mass Spectrometry (SIMS), Atom Probe Tomography (APT) and X-ray Photoelectron Spectroscopy (XPS). SIMS and APT measurements indicated the presence of Ag in the co-implanted samples after annealing at 1500 °C for 30 h in sharp contrast to the samples implanted with Ag only. In samples implanted with Ag only, complete loss of the implanted Ag was observed. However, for I only implanted samples, some iodine was retained. APT of annealed co-implanted 6H-SiC showed clear spatial association of Ag and I clusters in SiC, which can be attributed to the observed I assisted retention of Ag after annealing. Such detailed studies will be necessary to identify the fundamental mechanism of fission products migration through SiC coatings.

  13. Surface modification of polymeric substrates by plasma-based ion implantation

    Science.gov (United States)

    Okuji, S.; Sekiya, M.; Nakabayashi, M.; Endo, H.; Sakudo, N.; Nagai, K.

    2006-01-01

    Plasma-based ion implantation (PBII) as a tool for polymer modification is studied. Polymeric films have good performances for flexible use, such as food packaging or electronic devices. Compared with inorganic rigid materials, polymers generally have large permeability for gases and moisture, which causes packaged contents and devices to degrade. In order to add a barrier function, surface of polymeric films are modified by PBII. One of the advantageous features of this method over deposition is that the modified surface does not have peeling problem. Besides, micro-cracks due to mechanical stress in the modified layer can be decreased. From the standpoint of mass production, conventional ion implantation that needs low-pressure environment of less than 10-3 Pa is not suitable for continuous large-area processing, while PBII works at rather higher pressure of several Pa. In terms of issues mentioned above, PBII is one of the most expected techniques for modification on flexible substrates. However, the mechanism how the barrier function appears by ion implantation is not well explained so far. In this study, various kinds of polymeric films, including polyethyleneterephthalate (PET), are modified by PBII and their barrier characteristics that depend on the ion dose are evaluated. In order to investigate correlations of the barrier function with implanted ions, modified surface is analyzed with X-ray photoelectron spectroscopy (XPS). It is assumed that the diffusion and sorption coefficients are changed by ion implantation, resulting in higher barrier function.

  14. Synergistic effects of iodine and silver ions co-implanted in 6H–SiC

    International Nuclear Information System (INIS)

    Kuhudzai, R.J.; Malherbe, J.B.; Hlatshwayo, T.T.; Berg, N.G. van der; Devaraj, A.; Zhu, Z.; Nandasiri, M.

    2015-01-01

    Motivated by the aim of understanding the release of fission products through the SiC coating of fuel kernels in modern high temperature nuclear reactors, a fundamental investigation is conducted to understand the synergistic effects of implanted silver (Ag) and iodine (I) in 6H–SiC. The implantation of the individual species, as well as the co-implantation of 360 keV ions of I and Ag at room temperature in 6H–SiC and their subsequent annealing behaviour has been investigated by Secondary Ion Mass Spectrometry (SIMS), Atom Probe Tomography (APT) and X-ray Photoelectron Spectroscopy (XPS). SIMS and APT measurements indicated the presence of Ag in the co-implanted samples after annealing at 1500 °C for 30 h in sharp contrast to the samples implanted with Ag only. In samples implanted with Ag only, complete loss of the implanted Ag was observed. However, for I only implanted samples, some iodine was retained. APT of annealed co-implanted 6H–SiC showed clear spatial association of Ag and I clusters in SiC, which can be attributed to the observed I assisted retention of Ag after annealing. Such detailed studies will be necessary to identify the fundamental mechanism of fission products migration through SiC coatings. - Highlights: • Co-implantation of Ag and I ions in 6H–SiC was performed. • Clear spatial association of Ag and I clusters observed after annealing. • Complete loss of Ag after high temperature annealing of silver only sample. • Iodine was retained in iodine only sample after high temperature annealing. • Iodine was found to play a role in the retention of Ag in the co-implanted samples.

  15. Ultrathin Nitrogen-Doped Carbon Layer Uniformly Supported on Graphene Frameworks as Ultrahigh-Capacity Anode for Lithium-Ion Full Battery.

    Science.gov (United States)

    Huang, Yanshan; Li, Ke; Yang, Guanhui; Aboud, Mohamed F Aly; Shakir, Imran; Xu, Yuxi

    2018-01-24

    The designable structure with 3D structure, ultrathin 2D nanosheets, and heteroatom doping are considered as highly promising routes to improve the electrochemical performance of carbon materials as anodes for lithium-ion batteries. However, it remains a significant challenge to efficiently integrate 3D interconnected porous frameworks with 2D tunable heteroatom-doped ultrathin carbon layers to further boost the performance. Herein, a novel nanostructure consisting of a uniform ultrathin N-doped carbon layer in situ coated on a 3D graphene framework (NC@GF) through solvothermal self-assembly/polymerization and pyrolysis is reported. The NC@GF with the nanosheets thickness of 4.0 nm and N content of 4.13 at% exhibits an ultrahigh reversible capacity of 2018 mA h g -1 at 0.5 A g -1 and an ultrafast charge-discharge feature with a remarkable capacity of 340 mA h g -1 at an ultrahigh current density of 40 A g -1 and a superlong cycle life with a capacity retention of 93% after 10 000 cycles at 40 A g -1 . More importantly, when coupled with LiFePO 4 cathode, the fabricated lithium-ion full cells also exhibit high capacity and excellent rate and cycling performances, highlighting the practicability of this NC@GF. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  16. Modification of surface properties of yttria stabilized zirconia by ion implantation

    Science.gov (United States)

    Legg, K. O.; Cochran, J. K.; Solnick-Legg, H. F.; Mann, X. L.

    1985-03-01

    In order to determine in what ways ion implantation and subsequent heat treatment can be used to improve mechanical properties of ceramics, (110) yttria stabilized zirconia (YSZ) was implanted with Al + or Zr + ions and heat treated at a series of temperatures. Ion doses from 10 16 to 4 × 10 17{ion}/{cm 2} were used, with annealing temperatures up to 1575°C. In Al + implanted samples, many small precipitates formed at temperatures of about 1200δC, while at higher temperatures, the alumminum was precipitated as micro-sized alumina crystallites with 10-20% increases in hardness and fracture toughness. However, by allowing sufficient time for the nucleation of a large number of precipitates in the 1150 to 1250°C range, a new nucleation controlled microstructure (NCM) was formed, consisting of interlocking zirconia and alumina phases which exhibited improvements of 50% in fracture toughness and 25% in hardness.

  17. Annealing effect on planar waveguides in LiNbO 3 produced by oxygen ion implantation

    Science.gov (United States)

    Liu, Xiu-Hong; Huang, Qing; Zhao, Jin-Hua; Liu, Peng; Wang, Xue-Lin; Du, Ji-Fu; Huang, Ning-Kang

    2011-01-01

    We reported on planar waveguides in stoichiometric lithium niobate fabricated by 4.5 MeV oxygen ion implantation with a dose of 6 × 10 14 ions/cm 2 at room temperature. After ion implantation, these samples were annealed at 240 °C, 260 °C, and 300 °C for 30 min. We investigated annealing effect on the guiding modes and near-field images in the waveguides by prism-coupling method and end-face coupling method respectively. We found that for the extraordinary refractive index a positive alternation occurred in the near-surface region while a negative alternation happened at the end of ion track. Moreover, we measured the transmission spectra for the pure sample and implanted samples before and after annealed at different temperatures, and we observed an absorption peak at ˜480 nm (2.6 eV) in all of these SLN samples.

  18. The production of optical waveguides by ion implantation: the case of rutile

    Energy Technology Data Exchange (ETDEWEB)

    Rickards, J.; Trejo L, R.; Flores R, E.; Golzarri, J. I.; Espinosa, G., E-mail: rickards@fisica.unam.m [UNAM, Instituto de Fisica, Apdo. Postal 20-364, 01000 Mexico D. F. (Mexico)

    2011-02-15

    With the purpose of developing optoelectronic devices, optical waveguides have been produced by ion implantation in many solids. The implantation process creates a damaged layer near the end of the ion trajectories, with a consequent reduction of density and index of refraction. This produces an optical barrier at a depth of a few microns, depending on the type of ion and its energy. The barrier and the surface constitute a planar waveguide. Rutile (TiO{sub 2} tetragonal structure) single crystals were implanted with 7 MeV carbon ions using the Physics Institute 3 MV Pelletron Accelerator, in the (100) and (001) directions, and Poly Allyl Diglycol Carbonate (P ADC) as detection material. The waveguides were observed using the coupled prism technique, which indicated differences in the waveguides produced for different directions due to crystal anisotropy. (Author)

  19. Post-annealing recrystallization and damage recovery process in Fe ion implanted Si

    International Nuclear Information System (INIS)

    Naito, Muneyuki; Hirata, Akihiko; Ishimaru, Manabu; Hirotsu, Yoshihiko

    2007-01-01

    We have investigated ion-beam-induced and thermal annealing-induced microstructures in high fluence Fe implanted Si using transmission electron microscopy. Si(1 1 1) substrates were irradiated with 120 keV Fe ions at 120 K to fluences of 0.4 x 10 17 and 4.0 x 10 17 cm -2 . A continuous amorphous layer was formed on Si substrates in both as-implanted samples. After thermal annealing at 1073 K for 2 h, β-FeSi 2 fine particles buried in a polycrystalline Si layer were observed in the low fluence sample, while a continuous β-FeSi 2 layer was formed in the high fluence sample. We discuss the relationship between ion fluence and defects recovery process in Fe ion implanted Si

  20. Effects of sulphur ion implantation on the electrochemical behaviour of two stainless steels in sulphuric medium

    International Nuclear Information System (INIS)

    Nader-Roux, J.; Becdelievre, A.M. de; Gaillard, F.; Roux, R.; Becdelievre, J. de

    1986-01-01

    The electrochemical behaviour in sulphuric acid of two austenitic stainless steels (AISI 304 L and AISI 321) modified by sulphur ion implantation has been studied. Surface analysis of oxygen and sulphur by LEEIXS and XRFS were performed before and after polarization on unimplanted and on implanted samples. I/E curves with implanted steels reveal an important corrosion peak (α peak) recovering widely the active peak of unimplanted samples. For high implanted doses, another peak (β peak) appears in the passive range. High doses implanted steels polarized in the range of the α peak exhibit a sulphur enriched black surface layer. SEM examination of this layer shows it is constituted by flakes rolling up themselves. The formation of a superficial non-protective sulphide layer and the internal stresses of this layer explain the corrosion enhancement of sulphur implanted materials. After dissolution of this layer the behaviour of unimplanted steels is found again. (author)

  1. Application of Coaxial Ion Gun for Film Generation and Ion Implantation

    Science.gov (United States)

    Takatsu, Mikio; Asai, Tomohiko; Kurumi, Satoshi; Suzuki, Kaoru; Hirose, Hideharu; Masutani, Shigeyuki

    A magnetized coaxial plasma gun (MCPG) is here utilized for deposition on high-melting-point metals. MCPGs have hitherto been studied mostly in the context of nuclear fusion research, for particle and magnetic helicity injection and spheromak formation. During spheromak formation, the electrode materials are ionized and mixed into the plasmoid. In this study, this ablation process by gun-current sputtering is enhanced for metallic thin-film generation. In the proposed system geometry, only ionized materials are electromagnetically accelerated by the self-Lorentz force, with ionized operating gas as a magnetized thermal plasmoid, contributing to the thin-film deposition. This reduces the impurity and non-uniformity of the deposited thin-film. Furthermore, as the ions are accelerated in a parallel direction to the injection axis, vertical implantation of the ions into the substrate surface is achieved. To test a potential application of the developed system, experiments were conducted involving the formation of a buffer layer on hard ceramics, for use in dental materials.

  2. Mechanical and tribological properties of AISI 304 stainless steel nitrided by glow discharge compared to ion implantation and plasma immersion ion implantation

    Science.gov (United States)

    Foerster, C. E.; Serbena, F. C.; da Silva, S. L. R.; Lepienski, C. M.; Siqueira, C. J. de M.; Ueda, M.

    2007-04-01

    Results about mechanical and tribological behavior of AISI 304 stainless steel nitrided by three different ion beam processes - glow discharge (GD), ion implantation (II) and plasma immersion ion implantation (PI3) are reported. Expanded austenite γN and nitrides phases (Fe2+xN, γ‧-Fe4N and Cr-N) were identified as a function of nitriding conditions. Hardness (H) and elastic modulus (E) profiles were obtained by instrumented penetration. The hardness reached values as high as 21 GPa by PI3. Tribological behavior was studied by reciprocating sliding tests with a WC (Co) ball at room temperature (RT) in dry condition. Different wear regimes were identified in the friction coefficient profiles. The profile form and the running-in distance are strongly dependent on the nitriding process. Adhesive and abrasive wear components can be inferred from these friction profiles. Hardness and tribological performance, after the nitriding processes, are discussed in terms of surface microstructure.

  3. Corrosion behavior of low energy, high temperature nitrogen ion-implanted AISI 304 stainless steel

    Science.gov (United States)

    Ghoranneviss, M.; Shokouhy, A.; Larijani, M. M.; Haji Hosseini, S. H.; Yari, M.; Anvari, A.; Gholipur Shahraki, M.; Sari, A. H.; Hantehzadeh, M. R.

    2007-01-01

    This work presents the results of a low-energy nitrogen ion implantation of AISI 304 type stainless steel (SS) at a moderate temperature of about 500°C. The nitrogen ions are extracted from a Kauffman-type ion source at an energy of 30 keV, and ion current density of 100 μA cm^{-2}. Nitrogen ion concentration of 6 × 10^{17}, 8 × 10^{17} and 10^{18} ions cm^{-2}, were selected for our study. The X-ray diffraction results show the formation of CrN polycrystalline phase after nitrogen bombardment and a change of crystallinity due to the change in nitrogen ion concentration. The secondary ion mass spectrometry (SIMS) results show the formation of CrN phases too. Corrosion test has shown that corrosion resistance is enhanced by increasing nitrogen ion concentration.

  4. Use of low-energy hydrogen ion implants in high-efficiency crystalline-silicon solar cells

    Science.gov (United States)

    Fonash, S. J.; Sigh, R.; Mu, H. C.

    1986-01-01

    The use of low-energy hydrogen implants in the fabrication of high-efficiency crystalline silicon solar cells was investigated. Low-energy hydrogen implants result in hydrogen-caused effects in all three regions of a solar cell: emitter, space charge region, and base. In web, Czochralski (Cz), and floating zone (Fz) material, low-energy hydrogen implants reduced surface recombination velocity. In all three, the implants passivated the space charge region recombination centers. It was established that hydrogen implants can alter the diffusion properties of ion-implanted boron in silicon, but not ion-implated arsenic.

  5. Investigation of Donor and Acceptor Ion Implantation in AlN

    Energy Technology Data Exchange (ETDEWEB)

    Osinsky, Andrei [Agnitron Technology Inc., Eden Prairie, MN (United States)

    2015-09-16

    AlGaN alloys with high Al composition and AlN based electronic devices are attractive for high voltage, high temperature applications, including microwave power sources, power switches and communication systems. AlN is of particular interest because of its wide bandgap of ~6.1eV which is ideal for power electronic device applications in extreme environments which requires high dose ion implantation. One of the major challenges that need to be addressed to achieve full utilization of AlN for opto and microelectronic applications is the development of a doping strategy for both donors and acceptors. Ion implantation is a particularly attractive approach since it allows for selected-area doping of semiconductors due to its high spatial and dose control and its high throughput capability. Active layers in the semiconductor are created by implanting a dopant species followed by very high temperature annealing to reduce defects and thereby activate the dopants. Recovery of implant damage in AlN requires excessively high temperature. In this SBIR program we began the investigation by simulation of ion beam implantation profiles for Mg, Ge and Si in AlN over wide dose and energy ranges. Si and Ge are implanted to achieve the n-type doping, Mg is investigated as a p-type doping. The simulation of implantation profiles were performed in collaboration between NRL and Agnitron using a commercial software known as Stopping and Range of Ions in Matter (SRIM). The simulation results were then used as the basis for ion implantation of AlN samples. The implanted samples were annealed by an innovative technique under different conditions and evaluated along the way. Raman spectroscopy and XRD were used to determine the crystal quality of the implanted samples, demonstrating the effectiveness of annealing in removing implant induced damage. Additionally, SIMS was used to verify that a nearly uniform doping profile was achieved near the sample surface. The electrical characteristics

  6. Fractal pattern growth in Ti-implanted steel with high ion flux

    CERN Document Server

    Zhang Ton Ghe; Liu An Dong

    2002-01-01

    The author report on the formation of metal nano-metre phase and fractal patterns in steel using metal vapour vacuum arc source ion implantation with high ion flux. The dense nano-metre phases are cylindrical and well dispersed in the Ti-implanted layer with an ion flux up to 50 mu A/cm sup 2. The collision fractal pattern is formed in Ti-implanted steel with an ion flux of 25 mu A/cm sup 2 and the disconnected fractal pattern is observed with an ion flux of 50 mu A/cm sup 2. The average density of nano-metre phases decreases from 1.2 x 10 sup 1 sup 1 /cm sup 2 to 6.5 x 10 sup 1 sup 0 /cm sup 2 as the ion flux increases from 25 mu A/cm sup 2 to 50 mu A/cm sup 2. Fractal pattern growth is in remarkable agreement with Sander's diffusion-limited aggregation model. The alloy clusters have diffused and aggregated in chains forming branches to grow a beautiful tree during Ti implantation with an ion flux ranging from 75 mu A/cm sup 2 to 85 mu A/cm sup 2. The authors discuss the model of fractal pattern growth durin...

  7. Microstructure characterization and optical properties of sapphire after helium ion implantation

    Science.gov (United States)

    Zhong, Mian; Yang, Liang; Shen, Huahai; Liu, Wei; Xiang, Xia; Zheng, Wanguo; Guo, Decheng; Huang, Jin; Sun, Kai; Yuan, Xiaodong

    2015-06-01

    The (0 0 0 1) sapphire samples are irradiated with 60 keV helium ions at the fluences of 5 × 1016, 1 × 1017and 5 × 1017 ions/cm2 at room temperature. After implantation, two broad absorption bands at 320-460 and 480-700 nm are observed and their intensities increase with the increasing ion fluence. The grazing incidence X-ray diffraction results indicate that the {0 0 0 1} diffraction peaks of sapphire decrease and broaden due to the disorientation of the generated crystallites after ion irradiation. The microstructure evolution is examined by the scanning and transmission electron microscopes. The surface becomes rough because of the aggregation of helium bubbles and migration towards the surface. There is a lattice expansion up to ∼4.5% in the implanted area and the lattice distortion measured from dispersion of (1 1 0) diffraction is ∼4.6°. Such strain of crystal lattice is rather large and leads to contrast fluctuation at scale of 1-2 nm (the bubble size). The laser induced damage threshold (LIDT) is investigated to understand the effect of helium ion beam irradiation on the laser damage resistance of sapphire components and the results show that the LIDT decreases from 5.4 to 2.5 J/cm2 due to the absorptive color centers, helium bubbles and defects induced by helium ion implantation. The laser damage morphologies of samples before and after ion implantation are also presented.

  8. Studies on mass deposition effect and energy effect of biomolecules implanted by N+ ion beam

    International Nuclear Information System (INIS)

    Shao Chunlin; Yu Zengliang

    1994-05-01

    By analyzing some spectrum of tyrosine sample implanted by N + ion beam, it is deduced that the implantation N + could react with the tyrosine molecule and substitute =C 5 H- group of benzene ring to produce a N-heterocyclic compound. This compound would notably affect the residual activity of the sample. Moreover, the percentage of the product molecules to the damaged tyrosine molecules is larger than the reciprocal of the proportion of their extinction coefficients. On the other hand, by comparing the release of inorganic phosphate, it is found that the radiation sensibility for four basic nucleotides is 5'-dTMP>5'-CMP>5'-GMP>5'-AMP. to implanted nucleotides, alkali treatment and heat treatment could increase the amount of inorganic phosphate. The amount of inorganic phosphate in the nucleotide samples directly implanted by ions beam is about 60% of the total amount of inorganic phosphate that could be released from the implanted samples heated at 90 degree C for 1.75 hours. Alkali treatment could damage and split the free bases released from the implanted nucleotides, but heat treatment might repair those damaged bases. Above results prove that ions implantation to biomolecules has the mass deposition effects and energy effects

  9. The effect of MEVVA ion implantation on the tribological properties of PVD-TiN films

    International Nuclear Information System (INIS)

    Manory, R.; Mollica, S.

    1998-01-01

    The present work is the first study in which the effects of metal evaporation vacuum (MEVVA) implantation are studied on TiN of the PVD type which is commercially available in Australia. The MEVVA ion implanter differs from the 'conventional' type of ion implanter in the fact that it has a high throughput of metal ions which are not mass analysed and therefore has more potential for industrial non-electronic applications. TiN-coated steel samples have been implanted with two types of species - one light and one heavy - C + and W + respectively. The samples were analysed by Rutherford backscattering (RBS) and x-ray diffraction (XRD). The tribological performance was assessed by pin-on-disc and microhardness. The results show that carbon implantation was very effective in improving the friction coefficient by the formation of a carbonaceous layer on the surface. XRD also shows formation of TiC in the near surface region. W implantation does not improve the friction coefficient but improves the lifetime of the coating. Unimplanted films fail in the pin-on-disk test after 7000 cycles, whereas implanted films are still well adhered after 18000 cycles

  10. The biomedical properties of polyethylene terephthalate surface modified by silver ion implantation

    International Nuclear Information System (INIS)

    Wang Jin; Li Jianxin; Shen Liru; Ling Ren; Xu Zejin; Zhao Ansha; Leng Yongxiang; Huang Nan

    2007-01-01

    Polyethylene terephthalate (PET) film is modified by Ag ion implantation with a fluence 1 x 10 16 ions/cm 2 . The results of X-Ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) indicate that silver has been successfully implanted into the surface of PET. The PET samples modified by silver ion implantation have significantly bactericidal property. The capacity of the staphylococcus epidermidis (SE) adhered on the Ag + implanted PET surface is 5.3 x 10 6 CFU/ml, but the capacity of the SE adhered on the untreated PET film is 2.23 x 10 7 CFU/ml. The thromboembolic property is evaluated by in vitro platelet adhesion test, and there is not statistically difference between the untreated PET and the Ag + implanted PET for the number of adhered and activated platelets. The PET implanted by silver ion has not acute toxicity to endothelial cell (EC) which was evaluated by the release of lactate dehydrogenase (LDH) test

  11. Improvement of in vitro corrosion and cytocompatibility of biodegradable Fe surface modified by Zn ion implantation

    Science.gov (United States)

    Wang, Henan; Zheng, Yang; Li, Yan; Jiang, Chengbao

    2017-05-01

    Pure Fe was surface-modified by Zn ion implantation to improve the biodegradable behavior and cytocompatibility. Surface topography, chemical composition, corrosion resistance and cytocompatibility were investigated. Atomic force microscopy, auger electron spectroscopy and X-ray photoelectron spectroscopy results showed that Zn was implanted into the surface of pure Fe in the depth of 40-60 nm and Fe2O3/ZnO oxides were formed on the outmost surface. Electrochemical measurements and immersion tests revealed an improved degradable behavior for the Zn-implanted Fe samples. An approximately 12% reduction in the corrosion potential (Ecorr) and a 10-fold increase in the corrosion current density (icorr) were obtained after Zn ion implantation with a moderate incident ion dose, which was attributed to the enhanced pitting corrosion. The surface free energy of pure Fe was decreased by Zn ion implantation. The results of direct cell culture indicated that the short-term (4 h) cytocompatibility of MC3T3-E1 cells was promoted by the implanted Zn on the surface.

  12. Formation of gold nanoclusters in MgO by ion implantation at elevated temperatures

    International Nuclear Information System (INIS)

    Fedorov, A.V.; Huis, M.A. van; Veen, A. van; Schut, H.

    2000-01-01

    Gold nanoclusters were formed in (1 0 0) MgO containing nanosize cavities. Nanocavities were created by a combination of 30 keV 3 He implantation and subsequent annealing. Au was introduced inside the cavities by 30 keV Au ion implantation. The implantation dose varied from 10 16 to 3x10 16 cm -2 and the implantation temperature varied from room temperature (RT) to 1270 K. In the case of the RT implantations the samples were subsequently annealed stepwise in air up to 1370 K. The evolution of the implantation defects and the formation of nanoclusters was monitored by positron beam analysis (PBA), optical absorption spectrometry and Rutherford backscattering spectroscopy (RBS)/channeling. Optical absorption resonance peaks were observed at 570-610 nm for the RT implantations and at 525-550 nm for the implantations carried out at elevated temperatures. In the case of 1270 K implantation an extra absorption peak at 818 nm was observed. The influence of the implantation temperature on shape and position of the absorption band ascribed to nanoclusters is discussed

  13. Effect of H + ion implantation on structural, morphological, optical and dielectric properties of L-arginine monohydrochloride monohydrate single crystals

    Science.gov (United States)

    Sangeetha, K.; Babu, R. Ramesh; Kumar, P.; Bhagvannarayana, G.; Ramamurthi, K.

    2011-06-01

    L-arginine monohydrochloride monohydrate (LAHCl) single crystals have been implanted with 100 keV H + ions at different ion fluence ranging from 10 12 to 10 15 ions/cm 2. Implanted LAHCl single crystals have been investigated for property changes. Crystal surface and crystalline perfection of the pristine and implanted crystals were analyzed by atomic force microscope and high-resolution X-ray diffraction studies, respectively. Optical absorption bands induced by colour centers, refractive index and birefringence, mechanical stability and dielectric constant of implanted crystals were studied at different ion fluence and compared with that of pristine LAHCl single crystal.

  14. Ellipsometric and channeling studies on ion-implanted silicon

    International Nuclear Information System (INIS)

    Lohner, T.; Mezey, G.; Kotai, E.; Paszti, F.; Kiralyhidi, L.; Valyi, G.; Gyulai, J.

    1980-09-01

    RBS and ellipsometric investigations were combined to separate the contribution of radiation damage and overlayer contamination. It is pointed out that disorder effects which were produced by silicon self-implantation are shielded without proper surface cleaning. For cleaning, plasma stripping proved to be an effective method. The change in psi parameter could be correlated with the degree of amorphousness. It seems that Δ parameter ''feels'' crystalline-amorphous phase transition on low dose 31 P + and 27 Al + implants. No clear evidence was found for impurity effects on high-dose 75 As + and 31 P + implants. (author)

  15. Nanohardness, friction and wear properties of nitrogen ion implanted Ti-6Al-4V alloy

    International Nuclear Information System (INIS)

    Nath, V.C.; Sood, D.K.; Manory, R.R.

    1991-01-01

    Over the last few years a large amount of evidence has appeared in literature covering the effect of ion implantation on the wear behaviour of Ti-6A1-4V alloy, a material widely used in medical and aerospace applications. Recent studies have shown improved hardness and wear properties of this alloy in as-implanted condition only, and any post-implantation annealing treatment causes a reversal of this effect. In this paper the influence of higher energy and high dose nitrogen ion implantation followed by post-implantation annealing on the microhardness, friction and wear behaviour of polycrystalline Ti-6A1-4V alloy is demonstrated. Polycrystalline Ti-6A1-4V alloy samples were implanted with 150 kev N + ions, and the hardness, friction and wear behaviour was investigated before and after annealing at 705 deg C for 2 hours. The hardness was measured by an ultramicrohardness indentation system and wear and friction were evaluated by sliding 1.6 mm ruby ball against the discs. The results shows that the hardness increased by 150 % in as-implanted and 200 % in annealed sample, the coefficient of friction is reduced from 0.29 in virgin sample to 0.11 in as-implanted to 0.08 in annealed sample. Wear rate was reduced by 50 % in as-implanted and 67 % in annealed sample, while post-implantation annealing caused the formation of TiN phase at sub-surface of the sample. 4 refs., 3 figs

  16. Thermal annealing of waveguides formed by ion implantation of silica-on-si

    International Nuclear Information System (INIS)

    Johnson, C.M.; Ridgway, M.C.; Simpson, P.J.

    1998-01-01

    Full text: Buried channel waveguides were fabricated by ion implantation of PECVD-grown silica-on-Si. Post-implantation annealing was observed to have a significant influence on waveguide loss as measured at both 1.3 and 1.55 nm. Waveguide loss decreased abruptly from an as-implanted value of ∼1 dB/cm to ∼0.15 dB/cm following a 500 deg C/1 hr annealing cycle. However, annealing at greater temperatures (600 deg C) yielded a loss value comparable to the as implanted result (∼1dB/cm). This paper will address the factors that potentially influenced the observed loss behaviour which included thermally-induced changes to density and refractive index, precipitation of the implanted ions (Si) and mode profile spreading and subsequent interaction with the waveguide surface. Using surface profilometry and variable-energy positron spectroscopy, no significant density or structural changes were observed over the temperature range of 400-600deg C. The refractive index exhibited comparable behaviour as measured with prism coupling. The potential influence of precipitation was determined by comparing Si implantation with dual Si and O implantation, the latter with a dose ratio of 1:2. In addition, waveguides were also fabricated as a function of implantation energy to characterise the influence of the surface proximity

  17. Surface depression of glass and surface swelling of ceramics induced by ion implantation

    International Nuclear Information System (INIS)

    Ikeyama, Masami; Saitoh, Kazuo; Nakao, Setsuo; Niwa, Hiroaki; Tanemura, Seita; Miyagawa, Yoshiko; Miyagawa, Souji

    1994-01-01

    By the measurement of the change of the surface shapes of the glass and ceramics in which ion implantation was performed, it was clarified that glass surface was depressed, and ceramic surface swelled. These depression and swelling changed according to the kinds of ions, energy and the amount to be implanted and the temperature of samples. It became clear that the depression of glass surface was nearly proportional to the range of flight of the implanted ions, and the swelling of ceramic surface showed different state in the silicon nitride with strong covalent bond and the alumina and sapphire with strong ionic bond. For the improvement of the mechanical characteristics of solid materials such as hardness, strength, toughness, wear resistance, oxidation resistance and so on, attention has been paid to the surface reforming by high energy ion implantation at MeV level. The change of shapes of base materials due to ion implantation is not always negligible. The experiment was carried out on sintered silicon nitride and alumina, polished sapphire single crystals and quartz glass. The experimental method and the results are reported. (K.I.)

  18. Plasma immersion ion implantation for the efficient surface modification of medical materials

    Energy Technology Data Exchange (ETDEWEB)

    Slabodchikov, Vladimir A., E-mail: dipis1991@mail.ru; Borisov, Dmitry P., E-mail: borengin@mail.ru; Kuznetsov, Vladimir M., E-mail: kuznetsov@rec.tsu.ru [National Research Tomsk State University, Tomsk, 634050 (Russian Federation)

    2015-10-27

    The paper reports on a new method of plasma immersion ion implantation for the surface modification of medical materials using the example of nickel-titanium (NiTi) alloys much used for manufacturing medical implants. The chemical composition and surface properties of NiTi alloys doped with silicon by conventional ion implantation and by the proposed plasma immersion method are compared. It is shown that the new plasma immersion method is more efficient than conventional ion beam treatment and provides Si implantation into NiTi surface layers through a depth of a hundred nanometers at low bias voltages (400 V) and temperatures (≤150°C) of the substrate. The research results suggest that the chemical composition and surface properties of materials required for medicine, e.g., NiTi alloys, can be successfully attained through modification by the proposed method of plasma immersion ion implantation and by other methods based on the proposed vacuum equipment without using any conventional ion beam treatment.

  19. Ion beam investigation of hydrogen implanted in magnesium

    International Nuclear Information System (INIS)

    Chami, A.-C.

    1977-01-01

    The diffusion mechanism for hydrogen implanted in magnesium was investigated by nuclear reaction analysis or channeling. The hydrogen introduced is then in the presence of radiation defects created by implantation. The H( 11 B,α) reaction used allowed the profiles of implanted hydrogen to be drawn. The Winterbon calculations derived from LSS theory (Lindhard, Scharff, Schiott) were used. LSS profiles folding and the excitation curve unfolding give very same results. An analysis of the profile of the defects and the evaluation of the total number of Frenkel pairs produced show that the defects are isolated when low energy light elements are implanted, and hydrogen interactions are effected through point defects. A channeling analysis shows that hydrogen occupies tetrahedral sites as far as the temperature remains lower that the migration temperature (about 100K). Beyonds this temperature, the hydrogen migrates and is trapped on motionless defects [fr

  20. Recoil mixing in high-fluence ion implantation

    International Nuclear Information System (INIS)

    Littmark, U.; Hofer, W.O.

    1979-01-01

    The effect of recoil mixing on the collection and depth distribution of implanted projectiles during high-fluence irradiation of a random solid is investigated by model calculations based on a previously published transport theoretical approach to the general problem of recoil mixing. The most pronounced effects are observed in the maximum implantable amount of projectiles and in the critical fluence for saturation. Both values are significantly increased by recoil mixing. (Auth.)

  1. Synthesis of embedded titanium dioxide nanoparticles by oxygen ion implantation in titanium films

    Science.gov (United States)

    Rukade, Deepti. A.; Desai, C. A.; Kulkarni, Nilesh; Tribedi, L. C.; Bhattacharyya, Varsha

    2013-02-01

    Thin films of titanium of 100nm thickness are deposited on fused silica substrates. These films are implanted by oxygen ions with implantation energy of 60keV obtained from ECR based highly charged ion accelerator. The implanted films are later annealed in a tube furnace to establish nanophase formation. The post implanted annealed films are characterized by UV-Visible Spectroscopy and Glancing Angle X-ray Diffraction technique (GAXRD). The phase formed and particle size is determined by GAXRD. Nanoparticle formation is confirmed by the UV-VIS spectroscopic analysis that shows quantum size effects in the form of a blue shift in the band-gap energy of titanium-oxide.

  2. InGaAsP/InP quantum well buried heterostructure waveguides produced by ion implantation

    International Nuclear Information System (INIS)

    Zucker, J.E.; Jones, K.L.; Tell, B.; Brown-Goebeler, K.; Joyner, C.H.; Miller, B.I.; Young, M.G.

    1992-01-01

    Formation of buried InGaAsP/InP quantum well wave-guides by means of phosphorus ion implantation and thermal annealing during regrowth is demonstrated. Absorption spectra of implanted and unimplanted regions are used to estimate the induced index difference, which is of the order of 1% at 1.55μm. Calculated mode intensities are in good agreement with the observed near field intensity patterns. With this etchless implant technique, we achieve a significant reduction in propagation loss for singlemode pin waveguides relative to etched semi-insulating planar buried heterostructure waveguides fabricated from the same quantum well structure. In addition to reduced scattering loss, buried quantum well waveguides produced by ion implantation are more manufacturable because fewer and less-critical processing steps are involved. (author)

  3. An automated ion implant/pulse anneal machine for low cost silicon cell production

    International Nuclear Information System (INIS)

    Armini, A.J.; Bunker, S.N.; Spitzer, M.B.

    1982-01-01

    The continuing development of a high throughput ion implanter and a pulsed electron beam annealer designed for dedicated silicon solar cell manufacture is reviewed. This equipment is intended for production of junctions in 10 cm wide wafers at a throughput up to 10 MWsub(p) per year. The principal features of the implanter are the lack of mass analysis and defocusing utilizing electrostatic deflection. The implanted surface is annealed by liquid phase epitaxy resulting from a single burst of a large area electron beam. Cells with non-mass analyzed ion implantation have yielded AM1 cell efficiencies in excess of 15%. Pulse annealed Czochralski cells have been made with AM1 efficiencies of 13% vs. 15% for a furnace annealed group. Results of pulse annealing of polycrystalline materials indicate that cell performance comparable to diffusion can be obtained. (Auth.)

  4. Corrosion behaviour of ion implanted aluminium alloy in 0.1 M NaCl electrolyte

    Energy Technology Data Exchange (ETDEWEB)

    Chu, J.W.; Evans, P.J. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia); Sood, D.K. [Royal Melbourne Inst. of Tech., VIC (Australia)

    1993-12-31

    Aluminum and its alloys are widely used in industry because of their light weight, high strength and good corrosion resistance which is due to the formation of a protective oxide layer. However, under saline conditions such as those encountered in marine environments, this group of metals are vulnerable to localised degradation in the form of pitting corrosion. This type of corrosion involves the adsorption of an anion, such as chlorine, at the oxide solution interface. Ion implantation of metal ions has been shown to improve the corrosion resistance of a variety of materials. This effect occurs : when the implanted species reduces anion adsorption thereby decreasing the corrosion rate. In this paper we report on the pitting behavior of Ti implanted 2011 Al alloy in dilute sodium chloride solution. The Ti implanted surfaces exhibited an increased pitting potential and a reduced oxygen uptake. 5 refs., 3 figs.

  5. Oxygen ion implantation induced microstructural changes and electrical conductivity in Bakelite RPC detector material

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, K. V. Aneesh, E-mail: aneesh1098@gmail.com; Ravikumar, H. B., E-mail: hbr@physics.uni-mysore.ac.in [Department of Studies in Physics, University of Mysore, Mysore-570006 (India); Ranganathaiah, C., E-mail: cr@physics.uni-mysore.ac.in [Govt. Research Centre, Sahyadri Educational Institutions, Mangalore-575007 (India); Kumarswamy, G. N., E-mail: kumy79@gmail.com [Department of Studies in Physics, Amrita Vishwa Vidyapeetham, Bangalore-560035 (India)

    2016-05-06

    In order to explore the structural modification induced electrical conductivity, samples of Bakelite Resistive Plate Chamber (RPC) detector materials were exposed to 100 keV Oxygen ion in the fluences of 10{sup 12}, 10{sup 13}, 10{sup 14} and 10{sup 15} ions/cm{sup 2}. Ion implantation induced microstructural changes have been studied using Positron Annihilation Lifetime Spectroscopy (PALS) and X-Ray Diffraction (XRD) techniques. Positron lifetime parameters viz., o-Ps lifetime and its intensity shows the deposition of high energy interior track and chain scission leads to the formation of radicals, secondary ions and electrons at lower ion implantation fluences (10{sup 12} to10{sup 14} ions/cm{sup 2}) followed by cross-linking at 10{sup 15} ions/cm{sup 2} fluence due to the radical reactions. The reduction in electrical conductivity of Bakelite detector material is correlated to the conducting pathways and cross-links in the polymer matrix. The appropriate implantation energy and fluence of Oxygen ion on polymer based Bakelite RPC detector material may reduce the leakage current, improves the efficiency, time resolution and thereby rectify the aging crisis of the RPC detectors.

  6. Biofunctionalization of surfaces by energetic ion implantation: Review of progress on applications in implantable biomedical devices and antibody microarrays

    Science.gov (United States)

    Bilek, Marcela M. M.

    2014-08-01

    Despite major research efforts in the field of biomaterials, rejection, severe immune responses, scar tissue and poor integration continue to seriously limit the performance of today's implantable biomedical devices. Implantable biomaterials that interact with their host via an interfacial layer of active biomolecules to direct a desired cellular response to the implant would represent a major and much sought after improvement. Another, perhaps equally revolutionary, development that is on the biomedical horizon is the introduction of cost-effective microarrays for fast, highly multiplexed screening for biomarkers on cell membranes and in a variety of analyte solutions. Both of these advances will rely on effective methods of functionalizing surfaces with bioactive molecules. After a brief introduction to other methods currently available, this review will describe recently developed approaches that use energetic ions extracted from plasma to facilitate simple, one-step covalent surface immobilization of bioactive molecules. A kinetic theory model of the immobilization process by reactions with long-lived, mobile, surface-embedded radicals will be presented. The roles of surface chemistry and microstructure of the ion treated layer will be discussed. Early progress on applications of this technology to create diagnostic microarrays and to engineer bioactive surfaces for implantable biomedical devices will be reviewed.

  7. Computer simulation model of the structure of ion implanted impurities in semiconductors

    International Nuclear Information System (INIS)

    Roman, E.; Majlis, N.

    1983-02-01

    A system of ion implanted impurities in a semiconductor is described by a Monte Carlo simulation of a non-equilibrium system of random distributed hard spheres. The radial distribution function of this system is found. The comparison is made with the fluid hard sphere case. The assumption of the absence either of annealing or diffusion of the impurities after the implantation process is also made. (author)

  8. On the nature of the disordered layer produced by ion implantation

    International Nuclear Information System (INIS)

    Zellama, K.; Germain, P.; Squelard, S.; Bourgoin, J.C.; Piaguet, J.; Robic, J.Y.

    1978-01-01

    The aim of this communication is to compare some thermodynamic parameters measured in amorphous layers produced by evaporation and in disordered layers produced by ion implantation (which will be called implanted layers). The thermodynamics parameters studied are: the temperature of the annealing stages (reflecting the activation energies for atomic rearrangement) and the activation energy of the growth rate for crystallization. This investigation has been performed in germanium because the crystallization in this material has been extensively studied. (author)

  9. Metallic oxide nano-clusters synthesis by ion implantation in high purity Fe10Cr alloy

    International Nuclear Information System (INIS)

    Zheng, Ce

    2015-01-01

    ODS (Oxide Dispersed Strengthened) steels, which are reinforced with metal dispersions of nano-oxides (based on Y, Ti and O elements), are promising materials for future nuclear reactors. The detailed understanding of the mechanisms involved in the precipitation of these nano-oxides would improve manufacturing and mechanical properties of these ODS steels, with a strong economic impact for their industrialization. To experimentally study these mechanisms, an analytical approach by ion implantation is used, to control various parameters of synthesis of these precipitates as the temperature and concentration. This study demonstrated the feasibility of this method and concerned the behaviour of alloys models (based on aluminium oxide) under thermal annealing. High purity Fe-10Cr alloys were implanted with Al and O ions at room temperature. Transmission electron microscopy observations showed that the nano-oxides appear in the Fe-10Cr matrix upon ion implantation at room temperature without subsequent annealing. The mobility of implanted elements is caused by the defects created during ion implantation, allowing the nucleation of these nanoparticles, of a few nm in diameter. These nanoparticles are composed of aluminium and oxygen, and also chromium. The high-resolution experiments show that their crystallographic structure is that of a non-equilibrium compound of aluminium oxide (cubic γ-Al 2 O 3 type). The heat treatment performed after implantation induces the growth of the nano-sized oxides, and a phase change that tends to balance to the equilibrium structure (hexagonal α-Al 2 O 3 type). These results on model alloys are fully applicable to industrial materials: indeed ion implantation reproduces the conditions of milling and heat treatments are at equivalent temperatures to those of thermo-mechanical treatments. A mechanism involving the precipitation of nano-oxide dispersed in ODS alloys is proposed in this manuscript based on the obtained experimental results

  10. RTV silicone rubber surface modification for cell biocompatibility by negative-ion implantation

    Science.gov (United States)

    Zheng, Chenlong; Wang, Guangfu; Chu, Yingjie; Xu, Ya; Qiu, Menglin; Xu, Mi

    2016-03-01

    A negative cluster ion implantation system was built on the injector of a GIC4117 tandem accelerator. Next, the system was used to study the surface modification of room temperature vulcanization silicone rubber (RTV SR) for cell biocompatibility. The water contact angle was observed to decrease from 117.6° to 99.3° as the C1- implantation dose was increased to 1 × 1016 ions/cm2, and the effects of C1-, C2- and O1- implantation result in only small differences in the water contact angle at 3 × 1015 ions/cm2. These findings indicate that the hydrophilicity of RTV SR improves as the dose is increased and that the radiation effect has a greater influence than the doping effect on the hydrophilicity. There are two factors influence hydrophilicity of RTV: (1) based on the XPS and ATR-FTIR results, it can be inferred that ion implantation breaks the hydrophobic functional groups (Sisbnd CH3, Sisbnd Osbnd Si, Csbnd H) of RTV SR and generates hydrophilic functional groups (sbnd COOH, sbnd OH, Sisbnd (O)x (x = 3,4)). (2) SEM reveals that the implanted surface of RTV SR appears the micro roughness such as cracks and wrinkles. The hydrophilicity should be reduced due to the lotus effect (Zhou Rui et al., 2009). These two factors cancel each other out and make the C-implantation sample becomes more hydrophilic in general terms. Finally, cell culture demonstrates that negative ion-implantation is an effective method to improve the cell biocompatibility of RTV SR.

  11. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials

    Science.gov (United States)

    Hofmann, F.; Mason, D. R.; Eliason, J. K.; Maznev, A. A.; Nelson, K. A.; Dudarev, S. L.

    2015-11-01

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying with transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants.

  12. First results from the Los Alamos plasma source ion implantation experiment

    International Nuclear Information System (INIS)

    Rej, D.J.; Faehl, R.J.; Gribble, R.J.; Henins, I.; Kodali, P.; Nastasi, M.; Reass, W.A.; Tesmer, J.; Walter, K.C.; Wood, B.P.; Conrad, J.R.; Horswill, N.; Shamim, M.; Sridharan, K.

    1993-01-01

    A new facility is operational at Los Alamos to examine plasma source ion implantation on a large scale. Large workpieces can be treated in a 1.5-m-diameter, 4.6-m-long plasma vacuum chamber. Primary emphasis is directed towards improving tribological properties of metal surfaces. First experiments have been performed at 40 kV with nitrogen plasmas. Both coupons and manufactured components, with surface areas up to 4 m 2 , have been processed. Composition and surface hardness of implanted materials are evaluated. Implant conformality and dose uniformity into practical geometries are estimated with multidimensional particle-in-cell computations of plasma electron and ion dynamics, and Monte Carlo simulations of ion transport in solids

  13. The effect of ion implantation on the tribomechanical properties of carbon fibre reinforced polymers

    International Nuclear Information System (INIS)

    Mistica, R.; Sood, D.K.; Janardhana, M.N.

    1993-01-01

    Graphite fibre reinforced epoxy composite material (GFRP) is used extensively in the aerospace and other industries for structural application. The trend is to address the 20 to 30 year life endurance of this material in service. Mechanical joints in air crafts are exposed to dynamic loads during service and wear may be experienced by the composite material joint. Generally it has been shown that graphite fibre reinforced polymers have superior wear and friction properties as compared with the unfilled polymers. In the described experiment, ion implantation was used as a novel surface treatment. Wear and friction of a polymer composite material (GFRP) was studied and ion implantation was used in order to observe the effect on the tribomechanical properties of the material. It was found that ion implantation of C on GFRP sliding against Ti changes the tribological properties of the system, and in particular decreases the coefficient of friction and wear. 4 refs., 2 figs

  14. Corrosion resistance of modified layer on uranium formed by plasma immersion ion implantation

    International Nuclear Information System (INIS)

    Long Zhong; Liu Kezhao; Bai Bin; Yan Dongxu

    2010-01-01

    Nitrogen ion was implanted into uranium surface using plasma immersion ion implantation, and the corrosion resistance of modified layer was studied by corrosion experiment. SEM was used to observe variety of samples surface. In atmosphere, the sample surface had not changed during five months. In heat-humid environment, there was dot-corrosion appearing after two months, but it did not influence the integrity of the modified layer. AES was used to study the diffusion of oxygen and nitrogen during hot-humid corrosion, in three months, both of two elements diffused to the substrate, but the diffusion was weak. The structure of modified layer was not changed. Experimental results show that the modified layer formed by plasma immersion ion implantation has good corrosion resistance.

  15. Use of low energy hydrogen ion implants in high efficiency crystalline silicon solar cells

    Science.gov (United States)

    Fonash, S. J.; Singh, R.

    1985-01-01

    This program is a study of the use of low energy hydrogen ion implantation for high efficiency crystalline silicon solar cells. The first quarterly report focuses on two tasks of this program: (1) an examination of the effects of low energy hydrogen implants on surface recombination speed; and (2) an examination of the effects of hydrogen on silicon regrowth and diffusion in silicon. The first part of the project focussed on the measurement of surface properties of hydrogen implanted silicon. Low energy hydrogen ions when bombarded on the silicon surface will create structural damage at the surface, deactivate dopants and introduce recombination centers. At the same time the electrically active centers such as dangling bonds will be passivated by these hydrogen ions. Thus hydrogen is expected to alter properties such as the surface recombination velocity, dopant profiles on the emitter, etc. In this report the surface recombination velocity of a hydrogen emplanted emitter was measured.

  16. Modeling of X-ray rocking curves for layers after two-stage ion-implantation

    Directory of Open Access Journals (Sweden)

    O.I. Liubchenko

    2017-10-01

    Full Text Available In this work, we consider the approach for simulation of X-ray rocking curves inherent to InSb(111 crystals implanted with Be+ ions with various energies and doses. The method is based on the semi-kinematical theory of X-ray diffraction in the case of Bragg geometry. A fitting procedure that relies on the Hooke–Jeeves direct search algorithm was developed to determine the depth profiles of strain and structural disorders in the ion-modified layers. The thickness and maximum value of strain of ion-modified InSb(111 layers were determined. For implantation energies 66 and 80 keV, doses 25 and 50 µC, the thickness of the strained layer is about 500 nm with the maximum value of strain close to 0.1%. Additionally, an amorphous layer with significant thickness was found in the implantation region.

  17. Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

    International Nuclear Information System (INIS)

    Li Liuhe; Li Jianhui; Kwok, Dixon T. K.; Chu, Paul K.; Wang Zhuo

    2009-01-01

    Based on the multiple-grid particle-in-cell code, an advanced simulation model is established to study the sheath physics and dose uniformity along the sample stage in order to provide the theoretical basis for further improvement of enhanced glow discharge plasma immersion ion implantation and deposition. At t=7.0 μs, the expansion of the sheath in the horizontal direction is hindered by the dielectric cage. The electron focusing effect is demonstrated by this model. Most of the ions at the inside wall of the cage are implanted into the edge of the sample stage and a relatively uniform ion fluence distribution with a large peak is observed at the end. Compared to the results obtained from the previous model, a higher implant fluence and larger area of uniformity are disclosed.

  18. The effect of ion implantation on the tribomechanical properties of carbon fibre reinforced polymers

    Energy Technology Data Exchange (ETDEWEB)

    Mistica, R.; Sood, D.K. [Royal Melbourne Inst. of Tech., VIC (Australia); Janardhana, M.N. [Deakin University, Geelong, VIC (Australia). School of Engineering and Technology

    1993-12-31

    Graphite fibre reinforced epoxy composite material (GFRP) is used extensively in the aerospace and other industries for structural application. The trend is to address the 20 to 30 year life endurance of this material in service. Mechanical joints in air crafts are exposed to dynamic loads during service and wear may be experienced by the composite material joint. Generally it has been shown that graphite fibre reinforced polymers have superior wear and friction properties as compared with the unfilled polymers. In the described experiment, ion implantation was used as a novel surface treatment. Wear and friction of a polymer composite material (GFRP) was studied and ion implantation was used in order to observe the effect on the tribomechanical properties of the material. It was found that ion implantation of C on GFRP sliding against Ti changes the tribological properties of the system, and in particular decreases the coefficient of friction and wear. 4 refs., 2 figs.

  19. Ferromagnetism in ZnO doped with Co by ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Borges, R.P. [CFMCUL, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal)]. E-mail: rpborges@fc.ul.pt; Pinto, J.V. [CFMCUL, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal); LFI, Departamento de Fisica, ITN, Estrada Nacional 10, 2695-953 Sacavem (Portugal); CFNUL, Av. Prof. Gama Pinto 2, 1649-003 Lisbon (Portugal); Silva, R.C. da [LFI, Departamento de Fisica, ITN, Estrada Nacional 10, 2695-953 Sacavem (Portugal); CFNUL, Av. Prof. Gama Pinto 2, 1649-003 Lisbon (Portugal); Goncalves, A.P. [CFMCUL, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal); Departamento de Quimica, ITN, Estrada Nacional 10, 2695-953 Sacavem (Portugal); Cruz, M.M. [CFMCUL, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal); Fac.Ciencias, Universidade de Lisboa, Dep. Fisica, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal); Godinho, M. [CFMCUL, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal); Fac.Ciencias, Universidade de Lisboa, Dep. Fisica, Ed. C8, Campo Grande, 1749-016 Lisbon (Portugal)

    2007-09-15

    The importance of doping ZnO with magnetic ions is associated with the fact that this oxide is a good candidate for the formation of a magnetic-diluted semiconductor. Most of the studies reported in Co-doped ZnO were carried out in thin films, but the understanding of the modification of the magnetic behaviour due to doping demands the study of single-crystalline samples. In this work, ZnO single crystals were doped at room temperature with Co by ion implantation with fluences ranging between 2x10{sup 16} and 1x10{sup 17} ions cm{sup -2} and implantation energy of 100 keV. As implanted samples show a superparamagnetic behaviour attributed to the formation of Co clusters, room temperature ferromagnetism is attained after annealing at 800 deg. C, but no magnetoresistance was detected in the temperature range from 10 to 300 K.

  20. Homo-epitaxial diamond film growth on ion implanted diamond substrates

    Energy Technology Data Exchange (ETDEWEB)

    Weiser, P.S.; Prawer, S.; Nugent, K.W.; Bettiol, A.A.; Kostidis, L.I.; Jamieson, D.N. [Melbourne Univ., Parkville, VIC (Australia). School of Physics

    1996-12-31

    The nucleation of CVD diamond is a complicated process, governed by many interrelated parameters. In the present work we attempt to elucidate the effect of strain on the growth of a homo-epitaxial CVD diamond. We have employed laterally confined high dose (MeV) Helium ion implantation to produce surface swelling of the substrate. The strain is enhanced by the lateral confinement of the implanted region to squares of 100 x 100 {mu}m{sup 2}. After ion implantation, micro-Raman spectroscopy was employed to map the surface strain. The substrates were then inserted into a CVD reactor and a CVD diamond film was grown upon them. Since the strained regions were laterally confined, it was then possible to monitor the effect of strain on diamond nucleation. The substrates were also analysed using Rutherford Backscattering Spectroscopy (RBS), Proton induced X-ray Emission (PIXE) and Ion Beam induced Luminescence (IBIL). 7 refs., 5 figs.

  1. Formation of SiC using low energy CO2 ion implantation in silicon

    International Nuclear Information System (INIS)

    Sari, A.H.; Ghorbani, S.; Dorranian, D.; Azadfar, P.; Hojabri, A.R.; Ghoranneviss, M.

    2008-01-01

    Carbon dioxide ions with 29 keV energy were implanted into (4 0 0) high-purity p-type silicon wafers at nearly room temperature and doses in the range between 1 x 10 16 and 3 x 10 18 ions/cm 2 . X-ray diffraction analysis (XRD) was used to characterize the formation of SiC in implanted Si substrate. The formation of SiC and its crystalline structure obtained from above mentioned technique. Topographical changes induced on silicon surface, grains and evaluation of them at different doses observed by atomic force microscopy (AFM). Infrared reflectance (IR) and Raman scattering measurements were used to reconfirm the formation of SiC in implanted Si substrate. The electrical properties of implanted samples measured by four point probe technique. The results show that implantation of carbon dioxide ions directly leads to formation of 15R-SiC. By increasing the implantation dose a significant changes were also observed on roughness and sheet resistivity properties.

  2. Analysis of buried etch-stop layers in silicon by nitrogen-ion implantation

    International Nuclear Information System (INIS)

    Acero, M.C.; Esteve, J.; Montserrat, J.; Perez-Rodriguez, A.; Garrido, B.; Romano-Rodriguez, A.; Morante, J.R.

    1993-01-01

    The analysis of the etch-stop properties of layers obtained by substoichiometric nitrogen-ion implantation and annealing in silicon has been performed as a function of the implantation conditions. The analysis of the etching efficiency has been tested in TMAH-IPA systems. The results obtained show the need to implant at doses higher than 2 x 10 17 cm -2 to obtain etch-stop layers stable under high-temperature annealing. So, for implantation doses of 5 x 10 17 cm -2 , layers stand unetched for times longer than 2 h. The preliminary structural analysis of the samples suggests the presence of an amorphous silicon nitride layer for higher implantation doses. (author)

  3. Transmission electron microscope studies of laser and thermally annealed ion implanted silicon

    International Nuclear Information System (INIS)

    Narayan, J.; Young, R.T.; White, C.W.

    1978-01-01

    Transmission electron microscopy has been used to study the effects of high power laser pulses on boron, phosphorous and arsenic implanted [100] silicon crystals. No defects (dislocations, dislocation loops and/or stacking faults) were observed in either as-grown or implanted silicon after one pulse of ruby laser irradiation (lambda = 0.694 μm, pulse energy density 1.5 to 1.8 J cm -2 , 50 x 10 -9 pulse duration time). The concentration of boron in solution, as inferred from electrical measurements, could exceed the equilibrium solubility. In thermally annealed specimens, on the other hand, significant damage remained even after annealing at 1100 0 C for 30 minutes. On thermally annealing the implanted, laser-treated specimens, precipitation of the implanted boron ions occurred whenever the implanted doses were in excess of the equilibrium solubility limits. The relationship of these observations to the results of electrical measurements made on these samples will be discussed

  4. The effect of ion implantation on the resistance of 316L stainless steel to crevice corrosion

    International Nuclear Information System (INIS)

    Bombara, G.; Cavallini, M.

    1983-01-01

    The results of an investigation of the influence of aluminium, titanium and scandium implantation on the electrochemical and chemical crevice corrosion behaviour of 316L stainless steel are presented and discussed. Ion implantation, in addition to improving markedly the protective quality of the passive film at the free corrosion potential, greatly increases the resistance of 316L stainless steel to crevice corrosion in both neutral NaCl and acidic FeCl 3 solutions. A moderate decrease in pitting resistance is possibly due to coverage effect of implanted species on the surface molybdenum constituent. (Auth.)

  5. ESR studies of high-energy phosphorus-ion implanted synthetic diamond crystals

    Energy Technology Data Exchange (ETDEWEB)

    Isoya, J. [University of Library and Information Science, Tsukuba, Ibaraki (Japan); Kanda, H.; Morita, Y.; Ohshima, T.

    1997-03-01

    Phosphorus is among potential n-type dopants in diamond. High pressure synthetic diamond crystals of type IIa implanted with high energy (9-18 MeV) phosphorus ions have been studied by using electron spin resonance (ESR) technique. The intensity and the linewidth of the ESR signal attributed to the dangling bond of the amorphous phase varied with the implantation dose, suggesting the nature of the amorphization varies with the dose. The ESR signals of point defects have been observed in the low dose as-implanted crystals and in the high dose crystals annealed at high temperature and at high pressure. (author)

  6. Modifications of the hydriding kinetics of a metallic surface, using ion implantation

    International Nuclear Information System (INIS)

    Crusset, D.

    1992-10-01

    Uranium reacts with hydrogen to form an hydride: this reaction leads to the total destruction of the material. To modify the reactivity of an uranium surface towards hydrogen, ion implantation was selected, among surface treatments techniques. Four elements (carbon, nitrogen, oxygen, sulfur) were implanted to different doses. The results show a modification of the hydriding mechanism and a significant increase in the reaction induction times, notably at high implantation doses. Several techniques (SIMS, X-rays phases analysis and residual stresses determination) were used to characterize the samples and understand the different mechanisms involved

  7. RTV silicone rubber surface modification for cell biocompatibility by negative-ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Zheng, Chenlong [Key Laboratory of Beam Technology and Material Modification Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, 100875 Beijing (China); Wang, Guangfu, E-mail: 88088@bnu.edu.cn [Key Laboratory of Beam Technology and Material Modification Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, 100875 Beijing (China); Beijing Radiation Center, 100875 Beijing (China); Chu, Yingjie; Xu, Ya; Qiu, Menglin; Xu, Mi [Key Laboratory of Beam Technology and Material Modification Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, 100875 Beijing (China)

    2016-03-01

    Highlights: • The radiation effect has a greater influence than doping effect on the hydrophilicity of RTV SR. • The implanted ions result in a new surface atomic bonding state and morphology. • Generating hydrophilic functional groups is a reason for the improved cell biocompatibility. • The micro roughness makes the hydrophilicity should be reduced due to the lotus effect. • Cell culture demonstrates that negative-ion implantation can improve biocompatibility. - Abstract: A negative cluster ion implantation system was built on the injector of a GIC4117 tandem accelerator. Next, the system was used to study the surface modification of room temperature vulcanization silicone rubber (RTV SR) for cell biocompatibility. The water contact angle was observed to decrease from 117.6° to 99.3° as the C{sub 1}{sup −} implantation dose was increased to 1 × 10{sup 16} ions/cm{sup 2}, and the effects of C{sub 1}{sup −}, C{sub 2}{sup −} and O{sub 1}{sup −} implantation result in only small differences in the water contact angle at 3 × 10{sup 15} ions/cm{sup 2}. These findings indicate that the hydrophilicity of RTV SR improves as the dose is increased and that the radiation effect has a greater influence than the doping effect on the hydrophilicity. There are two factors influence hydrophilicity of RTV: (1) based on the XPS and ATR-FTIR results, it can be inferred that ion implantation breaks the hydrophobic functional groups (Si−CH{sub 3}, Si−O−Si, C−H) of RTV SR and generates hydrophilic functional groups (−COOH, −OH, Si−(O){sub x} (x = 3,4)). (2) SEM reveals that the implanted surface of RTV SR appears the micro roughness such as cracks and wrinkles. The hydrophilicity should be reduced due to the lotus effect (Zhou Rui et al., 2009). These two factors cancel each other out and make the C-implantation sample becomes more hydrophilic in general terms. Finally, cell culture demonstrates that negative ion-implantation is an effective method

  8. Grain size effect on yield strength of titanium alloy implanted with aluminum ions

    Energy Technology Data Exchange (ETDEWEB)

    Popova, Natalya, E-mail: natalya-popova-44@mail.ru [Tomsk State University of Architecture and Building, 2, Solyanaya Sq., 634003, Tomsk (Russian Federation); Institute of Strength Physics and Materials Science, SB RAS, 2/4, Akademicheskii Ave., 634021, Tomsk (Russian Federation); Nikonenko, Elena, E-mail: vilatomsk@mail.ru [Tomsk State University of Architecture and Building, 2, Solyanaya Sq., 634003, Tomsk (Russian Federation); National Research Tomsk Polytechnic University, 30, Lenin Str., 634050, Tomsk (Russian Federation); Yurev, Ivan, E-mail: yiywork@mail.ru [Tomsk State University of Architecture and Building, 2, Solyanaya Sq., 634003, Tomsk (Russian Federation); Kalashnikov, Mark, E-mail: kmp1980@mail.ru [Institute of Strength Physics and Materials Science, SB RAS, 2/4, Akademicheskii Ave., 634021, Tomsk (Russian Federation); Kurzina, Irina, E-mail: kurzina99@mail.ru [National Research Tomsk State University, 36, Lenin Str., 634050, Tomsk (Russian Federation)

    2016-01-15

    The paper presents a transmission electron microscopy (TEM) study of the microstructure and phase state of commercially pure titanium VT1-0 implanted by aluminum ions. This study has been carried out before and after the ion implantation for different grain size, i.e. 0.3 µm (ultra-fine grain condition), 1.5 µm (fine grain condition), and 17 µm (polycrystalline condition). This paper presents details of calculations and analysis of strength components of the yield stress. It is shown that the ion implantation results in a considerable hardening of the entire thickness of the implanted layer in the both grain types. The grain size has, however, a different effect on the yield stress. So, both before and after the ion implantation, the increase of the grain size leads to the decrease of the alloy hardening. Thus, hardening in ultra-fine and fine grain alloys increased by four times, while in polycrystalline alloy it increased by over six times.

  9. Study of the Local Environment of Mn Ions Implanted in GaSb

    International Nuclear Information System (INIS)

    Wolska, A.; Lawniczak-Jablonska, K.; Klepka, M.T.; Barcz, A.; Hallen, A.; Arvanitis, D.

    2010-01-01

    The first attempts to establish an implantation process leading to formation of ferromagnetic inclusions inside the GaSb matrix are presented. Gallium antimonide containing ferromagnetic MnSb precipitations is considered as a promising material for novel spintronic applications. It is possible to obtain such inclusions during the molecular beam epitaxy (MBE) growth. However, for commercial application it would be also important to find an optimal way of producing this kind of inclusions by Mn ions implantation. In order to achieve this goal, several parameters of implantation and post annealing procedures were tested. The ion energy was kept at 10 keV or 150 keV and four different ion doses were applied, as well as various annealing conditions. The analysis of X-ray absorption spectra allowed to estimate the local atomic order around Mn atoms. Depending on the implantation energy and annealing processes, the manganese oxides or manganese atoms located in a heavily defected GaSb matrix were observed. The performed analysis helped in indicating the main obstacles in formation of MnSb inclusions inside the GaSb matrix by Mn ion implantation. (author)

  10. Deep level defects in 4H-SiC introduced by ion implantation: the role of single ion regime.

    Science.gov (United States)

    Pastuović, Željko; Siegele, Rainer; Capan, Ivana; Brodar, Tomislav; Sato, Shin-Ichiro; Ohshima, Takeshi

    2017-11-29

    We characterized intrinsic deep level defects created in ion collision cascades which were produced by patterned implantation of single accelerated 2.0 MeV He and 600 keV H ions into n-type 4H-SiC epitaxial layers using a fast-scanning reduced-rate ion microbeam. The initial deep level transient spectroscopy measurement performed on as-grown material in the temperature range 150-700 K revealed the presence of only two electron traps, Z 1/2 (0.64 eV) and EH 6/7 (1.84 eV) assigned to the two different charge state transitions of the isolated carbon vacancy, V C (=/0) and (0/+). C-V measurements of as-implanted samples revealed the increasing free carrier removal with larger ion fluence values, in particular at depth corresponding to a vicinity of the end of an ion range. The first DLTS measurement of as-implanted samples revealed formation of additional deep level defects labelled as ET1 (0.35 eV), ET2 (0.65 eV) and EH3 (1.06 eV) which were clearly distinguished from the presence of isolated carbon vacancies (Z 1/2 and EH 6/7 defects) in increased concentrations after implantations either by He or H ions. Repeated C-V measurements showed that a partial net free-carrier recovery occurred in as-implanted samples upon the low-temperature annealing following the first DLTS measurement. The second DLTS measurement revealed the almost complete removal of ET2 defect and the partial removal of EH3 defect, while the concentrations of Z 1/2 and EH 6/7 defects increased, due to the low temperature annealing up to 700 K accomplished during the first temperature scan. We concluded that the ET2 and EH3 defects: (i) act as majority carrier removal traps, (ii) exhibit a low thermal stability and (iii) can be related to the simple point-like defects introduced by light ion implantation, namely interstitials and/or complex of interstitials and vacancies in both carbon and silicon sub-lattices.

  11. Ion implantation and rapid thermal processing of Ill-V nitrides

    Science.gov (United States)

    Zolper, J. C.; Hagerott Crawford, M.; Pearton, S. J.; Abernathy, C. R.; Vartuli, C. B.; Yuan, C.; Stall, R. A.

    1996-05-01

    Ion implantation doping and isolation coupled with rapid thermal annealing has played a critical role in the realization of high performance photonic and electronic devices in all mature semiconductor material systems. This is also expected to be the case for the binary III-V nitrides (InN, GaN, and A1N) and their alloys as the epitaxial material quality improves and more advanced device structures are fabricated. In this article, we review the recent developments in implant doping and isolation along with rapid thermal annealing of GaN and the In-containing ternary alloys InGaN and InAlN. In particular, the successful n- and p-type doping of GaN by ion implantation of Si and Mg+P, respectively, and subsequent high temperature rapid thermal anneals in excess of 1000°C is reviewed. In the area of implant isolation, N-implantation has been shown to compensate both n- and p-type GaN, N-, and O-implantation effectively compensates InAlN, and InGaN shows limited compensation with either N- or F-implantation. The effects of rapid thermal annealing on unimplanted material are also presented.

  12. Effect of cathodic hydrogenation on the mechanical properties of AISI 304 stainless steel nitrided by ion implantation, glow discharge and plasma immersion ion implantation

    Science.gov (United States)

    Foerster, C. E.; Souza, J. F. P.; Silva, C. A.; Ueda, M.; Kuromoto, N. K.; Serbena, F. C.; Silva, S. L. R.; Lepienski, C. M.

    2007-04-01

    Hydrogen embrittlement in austenitic stainless steels is restricted to the surface due to the low hydrogen diffusion in austenitic structures. The effect of three different nitriding processes: ion implantation (II), plasma immersion ion implantation (PI3) and glow discharge (GD), on the mechanical and structural properties of cathodically hydrogenated AISI 304 stainless steel were studied in the present work. Cathodic hydrogenation was made on untreated and nitrided samples. Surface microstructure after nitriding and hydrogenation was investigated by X-ray diffraction. Mechanical properties were measured by instrumented indentation. Surface crack formation and hardness decrease was observed in non-nitrided samples after cathodic hydrogenation. Hardness of nitrided samples decreases after hydrogen degassing but still has values higher than untreated samples. Comparative analysis of nitriding processes and working conditions indicated that glow discharge plasma nitriding process at 400 °C or 450 °C is the most adequate to avoid crack formation in steel surface after cathodic hydrogenation.

  13. Pd-based alloy nanoclusters in ion-implanted silica: Formation and stability under thermal annealing

    Energy Technology Data Exchange (ETDEWEB)

    Battaglin, G.; Cattaruzza, E.; De Marchi, G.; Gonella, F.; Mattei, G. E-mail: mattei@padova.infm.it; Maurizio, C.; Mazzoldi, P.; Parolin, M.; Sada, C.; Calliari, I

    2002-05-01

    In this work we report on the formation and stability under thermal annealing of Pd-Cu and Pd-Ag alloy nanoclusters obtained by sequential ion implantation in silica. The role of the annealing atmosphere on the alloy cluster formation and stability is investigated. A comparison is made with similar alloy-based systems obtained by sequential ion implantation in silica of Au-Ag or Au-Cu followed by annealing under similar conditions, in order to evidence the peculiar effect of the various metals in controlling the alloy evolution and/or decomposition.

  14. Plasma immersion ion implantation and deposition hybrid process on aluminum and titanium alloy

    International Nuclear Information System (INIS)

    Wang Langping; Wang Yuhang; Wang Xiaofeng; Tang Baoyin; Dong Shen

    2007-01-01

    Because of their variety excellent properties, aluminum and titanium alloy are widely used in aerospace, airplane, ship manufacture, energy source and chemical engineering. However, both of them show a low wear resistance. In our research, plasma immersion ion implantation and deposition was utilized to improve their wear resistance. The method of ion implantation + transition layer deposition + wear resistance layer deposition was applied on these alloys. And by employing the wear testing method, the influences of the structure and thickness of the transition layer on wear resistance were obtained. The experimental results reveal that the wear resistance of these alloys can be improved significantly by optimizing the processing window. (authors)

  15. Analysis of As implantation profiles in silica by nuclear microanalysis and secondary ion emission

    International Nuclear Information System (INIS)

    Dieumegard, D.; Croset, M.; Cohen, C.; Lhoir, A.; Rigo, S.; Chaumont, J.

    1974-01-01

    Results obtained from analysis using, either the method of elastic backscattering of light or semi-heavy ions ( 4 He + , 14 N + ) about one MeV energy, or the secondary ion emission method are compared. The choice of As implanted Si is explained by the following reasons: As is an element relatively heavy in comparison with Si, that allows an analysis to be effected on a few thousands Angstroems depth in silica using elastic backscattering; the silica chosen as substrate being an amorphous material allows channeling phenomena to the avoided during implantation and analysis [fr

  16. Study of highly functionalized metal surface treated by plasma ion implantation

    International Nuclear Information System (INIS)

    Ikeyama, Masami; Miyagawa, Soji; Miyagawa, Yoshiko; Nakao, Setsuo; Masuda, Haruho; Saito, Kazuo; Ono, Taizou; Hayashi, Eiji

    2004-01-01

    Technology for processing metal surfaces with hardness, low friction and free from foreign substances was developed with plasma ion implantation. Diamond-like carbon (DLC) coating is a most promising method for realization of hard and smooth metal surface. DLC coating was tested in a metal pipe with 10 mm diameter and 10 cm length by a newly developed plasma ion implantation instrument. The surface coated by DLC was proved to have characteristics equivalent to those prepared with other methods. A computer program simulating a formation process of DLC coating was developed. Experiments for fluorinating the DLC coating surface was performed. (Y. Kazumata)

  17. Method for Providing Semiconductors Having Self-Aligned Ion Implant

    Science.gov (United States)

    Neudeck, Philip G. (Inventor)

    2014-01-01

    A method is disclosed that provides a self-aligned nitrogen-implant particularly suited for a Junction Field Effect Transistor (JFET) semiconductor device preferably comprised of a silicon carbide (SiC). This self-aligned nitrogen-implant allows for the realization of durable and stable electrical functionality of high temperature transistors such as JFETs. The method implements the self-aligned nitrogen-implant having predetermined dimensions, at a particular step in the fabrication process, so that the SiC junction field effect transistors are capable of being electrically operating continuously at 500.degree. C. for over 10,000 hours in an air ambient with less than a 10% change in operational transistor parameters.

  18. Redesign of analyzer magnet on ion implanter using superfish and opera-3D simulator

    International Nuclear Information System (INIS)

    Taufik; Suprapto; Silakhuddin

    2012-01-01

    Redesign of analyzer magnet on ion implanter using superfish and opera-3D simulator has been done. In order for the implanted ions on a target is a single ion a magnetic analyzer is needed. The magnetic analyzer can separate some impurity ions from accelerated ion beams to produce a single ion beams. Ion implanter in PTAPB has been equipped with a magnetic analyzer, but the design details data were not available and the functions still were not optimal so that it will hamper for maintenance and development. The purpose of this activity is to obtain a document containing technical information and to optimize a magnetic analyzer design. To achieve these objectives, the activities initiated by searching for references related to the magnetic analyzer, perform detailed calculation with considering the existing parameters, simulation of the design that has been made, determination of design parameters and optimization of the designs. From this activity can be obtained a detailed design document of magnetic analyzer for 150 keV particle energy with 60° bending angle and the ability to separate particles with m / z = 8 amu. While the optimization of the previous design can be done by changing the shape of C-type magnetic core into H type, change the shape of the magnetic pole into a square with the position of incoming beam makes a positive θ angle and inclined to the edge of the magnetic poles. (author)

  19. An apparatus for combined vapor deposition and ion implantation to modify the surface properties of metals

    Science.gov (United States)

    Margesin, B.; Giacomozzi, F.; Guzman, L.; Lazzari, G.; Zanini, V.

    A low energy ion implanter has been adequately modified in order to perform reactive ion beam enhanced deposition (RIBED) and dynamic recoil ion mixing experiments under controlled conditions in a high vacuum environment. The machine consists of a Duoplasmatron ion source, a mass analyzer, a target chamber adaptable for use with various samples, and an electron gun evaporator equipped with a film thickness monitor. For a high degree of process automation the implantation chamber and the evaporator are controlled by a system based on two microprocessors in a master/slave configuration. The microprocessors are programmed in FORTH and communicate with each other in the same language. In this apparatus, independently controlled atom and ion beams of different species able to form the required compounds, impinge sequentially (or simultaneously) on a 4 × 8 cm 2 area with a good uniformity (10%). Ion mixing prevails in the first steps of the treatment, resulting in a good relative adhesion between substrate and film; then the RIBED film is grown up to typically 0.5 μm, this thickness being equivalent to a total implanted dose of 5.0 × 10 18 ions/cm 2 with an excellent depth homogeneity and without sputtering limitations.

  20. Effects of high-energy (MeV) ion implantation of polyester films

    International Nuclear Information System (INIS)

    Ueno, Keiji; Matsumoto, Yasuyo; Nishimiya, Nobuyuki; Noshiro, Mitsuru; Satou, Mamoru

    1991-01-01

    The effects of high-energy ion beam irradiation on polyester (PET) films using a 3 MeV tandem-type ion beam accelerator were studied. O, Ni, Pt, and Au as ion species were irradiated at 10 14 -10 15 ions/cm 2 on 50 μm thick PET films. Physical properties and molecular structure changes were studied by the surface resistivity measurements and RBS. The surface resistivity decreases with an increase in irradiation dose. At 10 15 ions/cm 2 irradiation, the surface resistivity is 10 8 Ω/□. According to RBS and XPS analyses, some carbon and oxygen atoms in the PET are replaced by implanted ions and the -C=O bonds are destroyed easily by the ion beam. (orig.)

  1. Effects of ion implantation on the hardness and friction behaviour of soda-lime silica glass

    International Nuclear Information System (INIS)

    Bull, S.J.; Page, T.F.

    1992-01-01

    Ion implantation-induced changes in the near-surface mechanical properties of soda-lime silica glass have been investigated by indentation and scratch testing and have been found to be more complicated than changes in the corresponding properties of crystalline ceramic materials. Argon, nitrogen, carbon and potassium ions were used with energies in the range 45-300 keV. Hardness and scratch friction tests were performed under ambient laboratory conditions. At low doses, a decrease in hardness and an increase in both friction and surface stress are observed which are attributed to the electronic damage produced by ion implantation. At higher doses, the hardness increases again and a maximum is produced similar to the behaviour observed for crystalline materials. Similarly there is found to be a second stress and friction peak at this dose. This behaviour is shown to be due to the build-up of displacement damage produced by ion implantation and is thus very similar to the radiation hardening (and eventual amorphization) behaviour of ion-implanted crystalline ceramics. For glass, ''amorphization'' probably corresponds to some change in the existing amorphous state which, in turn, is responsible for the reduction in hardness, stress and friction at the highest doses. (author)

  2. The air oxidation behavior of lanthanum ion implanted zirconium at 500 deg. C

    CERN Document Server

    Peng, D Q; Chen, X W; Zhou, Q G

    2003-01-01

    The beneficial effect of lanthanum ion implantation on the oxidation behavior of zirconium at 500 deg. C has been studied. Zirconium specimens were implanted by lanthanum ions using a MEVVA source at energy of 40 keV with a fluence range from 1x10 sup 1 sup 6 to 1x10 sup 1 sup 7 ions/cm sup 2 at maximum temperature of 130 deg. C, The weight gain curves were measured after being oxidized in air at 500 deg. C for 100 min, which showed that a significant improvement was achieved in the oxidation behavior of zirconium ion implanted with lanthanum compared with that of the as-received zirconium. The valence of the oxides in the scale was analyzed by X-ray photoemission spectroscopy; and then the depth distributions of the elements in the surface of the samples were obtained by Auger electron spectroscopy. Glancing angle X-ray diffraction at 0.3 deg. incident angles was employed to examine the modification of its phase transformation because of the lanthanum ion implantation in the oxide films. It was obviously fou...

  3. The damaging effects of nitrogen ion beam implantation on upland cotton (Gossypium hirsutum L.) pollen grains

    Energy Technology Data Exchange (ETDEWEB)

    Yu Yanjie [College of Agronomy, Nanjing Agricultural University, Nanjing Jiangsu 210095 (China); Wu Lijun; Wu Yuejin [Key Laboratory of Ion Beam Bioengineering, Institute of Plasma Physics, Chinese Academy of Sciences, Hefei, Anhui 230031 (China); Wang Qingya [College of Life Science, Nanjing Agricultural University, Nanjing, Jiangsu 210095 (China); Tang Canming [College of Agronomy, Nanjing Agricultural University, Nanjing Jiangsu 210095 (China)], E-mail: tang20@jlonline.com

    2008-09-15

    With the aim to study the effects of an ion beam on plant cells, upland cotton (Gossypium hirsutum L.) cultivar 'Sumian 22' pollen grains were irradiated in vacuum (7.8 x 10{sup -3} Pa) by low-energy nitrogen ions with an energy of 20 keV at various fluences ranging from 0.26 x 10{sup 16} to 0.78 x 10{sup 16} N{sup +}/cm{sup 2}. The irradiation effects on pollen grains were tested, considering the ultrastructural changes in the exine and interior walls of pollen grains, their germination rate, the growth speed of the pollen tubes in the style, fertilization and boll development after the pistils were pollinated by the pollen grains which had been implanted with nitrogen ions. Nitrogen ions entered the pollen grains by etching and penetrating the exine and interior walls and destroying cell structures. A greater percentage of the pollen grains were destroyed as the fluence of N{sup +} ions increased. Obviously, the nitrogen ion beam penetrated the exine and interior walls of the pollen grains and produced holes of different sizes. As the ion fluence increased, the amount and the density of pollen grain inclusions decreased and the size of the lacuna and starch granules increased. Pollen grain germination rates decreased with increasing ion fluence. The number of pollen tubes in the style declined with increased ion implantation into pollen grains, but the growth speed of the tubes did not change. All of the pollen tubes reached the end of the style at 13 h after pollination. This result was consistent with that of the control. Also, the weight and the diameter of the ovary decreased and shortened with increased ion beam implantation fluence. No evident change in the fecundation time of the ovule was observed. These results indicate that nitrogen ions can enter pollen grains and cause a series of biological changes in pollen grains of upland cotton.

  4. The damaging effects of nitrogen ion beam implantation on upland cotton ( Gossypium hirsutum L.) pollen grains

    Science.gov (United States)

    Yu, Yanjie; Wu, Lijun; Wu, Yuejin; Wang, Qingya; Tang, Canming

    2008-09-01

    With the aim to study the effects of an ion beam on plant cells, upland cotton (Gossypium hirsutum L.) cultivar "Sumian 22" pollen grains were irradiated in vacuum (7.8 × 10-3 Pa) by low-energy nitrogen ions with an energy of 20 keV at various fluences ranging from 0.26 × 1016 to 0.78 × 1016 N+/cm2. The irradiation effects on pollen grains were tested, considering the ultrastructural changes in the exine and interior walls of pollen grains, their germination rate, the growth speed of the pollen tubes in the style, fertilization and boll development after the pistils were pollinated by the pollen grains which had been implanted with nitrogen ions. Nitrogen ions entered the pollen grains by etching and penetrating the exine and interior walls and destroying cell structures. A greater percentage of the pollen grains were destroyed as the fluence of N+ ions increased. Obviously, the nitrogen ion beam penetrated the exine and interior walls of the pollen grains and produced holes of different sizes. As the ion fluence increased, the amount and the density of pollen grain inclusions decreased and the size of the lacuna and starch granules increased. Pollen grain germination rates decreased with increasing ion fluence. The number of pollen tubes in the style declined with increased ion implantation into pollen grains, but the growth speed of the tubes did not change. All of the pollen tubes reached the end of the style at 13 h after pollination. This result was consistent with that of the control. Also, the weight and the diameter of the ovary decreased and shortened with increased ion beam implantation fluence. No evident change in the fecundation time of the ovule was observed. These results indicate that nitrogen ions can enter pollen grains and cause a series of biological changes in pollen grains of upland cotton.

  5. Ion Implantation of In0.53Ga0.47As

    Energy Technology Data Exchange (ETDEWEB)

    Almonte, Marlene Isabel [Univ. of California, Berkeley, CA (United States)

    1999-05-01

    Studies of the effects of implanation in In0.53Ga0.47As due to damage by implantation of Ne+ ions and to compensation by implantation of Fe+ ions are reported in this thesis.

  6. Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate

    Energy Technology Data Exchange (ETDEWEB)

    Duchaine, J.; Milesi, F.; Coquand, R.; Barraud, S.; Reboh, S.; Gonzatti, F.; Mazen, F.; Torregrosa, Frank [IBS, ZI Peynier-Rousset, Avenue Gaston Imbert prolongee, 13 790 Peynier (France) and CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9 (France); CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9 (France); STMicroelectronics, 850, rue J. Monnet, 38926 Crolles (France); CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 GRENOBLE Cedex 9 (France); IBS, ZI Peynier-Rousset, Avenue Gaston Imbert prolongee, 13 790 Peynier (France)

    2012-11-06

    Here, we present and discuss the electrical characteristics of fully depleted MOSFET transistors of planar and tridimensional architecture, doped by Plasma Immersion Ion Implantation (PIII) or Beam Line Ion Implantation (BLII). Both techniques delivered similar and satisfactory results in considering the planar architecture. For tri-dimensional Tri-Gate transistors, the results obtained with PIII are superior.

  7. Tunnel oxide passivated contacts formed by ion implantation for applications in silicon solar cells

    International Nuclear Information System (INIS)

    Reichel, Christian; Feldmann, Frank; Müller, Ralph; Hermle, Martin; Glunz, Stefan W.; Reedy, Robert C.; Lee, Benjamin G.; Young, David L.; Stradins, Paul

    2015-01-01

    Passivated contacts (poly-Si/SiO x /c-Si) doped by shallow ion implantation are an appealing technology for high efficiency silicon solar cells, especially for interdigitated back contact (IBC) solar cells where a masked ion implantation facilitates their fabrication. This paper presents a study on tunnel oxide passivated contacts formed by low-energy ion implantation into amorphous silicon (a-Si) layers and examines the influence of the ion species (P, B, or BF 2 ), the ion implantation dose (5 × 10 14  cm −2 to 1 × 10 16  cm −2 ), and the subsequent high-temperature anneal (800 °C or 900 °C) on the passivation quality and junction characteristics using double-sided contacted silicon solar cells. Excellent passivation quality is achieved for n-type passivated contacts by P implantations into either intrinsic (undoped) or in-situ B-doped a-Si layers with implied open-circuit voltages (iV oc ) of 725 and 720 mV, respectively. For p-type passivated contacts, BF 2 implantations into intrinsic a-Si yield well passivated contacts and allow for iV oc of 690 mV, whereas implanted B gives poor passivation with iV oc of only 640 mV. While solar cells featuring in-situ B-doped selective hole contacts and selective electron contacts with P implanted into intrinsic a-Si layers achieved V oc of 690 mV and fill factor (FF) of 79.1%, selective hole contacts realized by BF 2 implantation into intrinsic a-Si suffer from drastically reduced FF which is caused by a non-Ohmic Schottky contact. Finally, implanting P into in-situ B-doped a-Si layers for the purpose of overcompensation (counterdoping) allowed for solar cells with V oc of 680 mV and FF of 80.4%, providing a simplified and promising fabrication process for IBC solar cells featuring passivated contacts

  8. The Use of Ion Implantation for Materials Processing.

    Science.gov (United States)

    1986-03-06

    IMplated : As alreadv discussed, the for crack propagation. Therefore, crack nucleation and friction reduction from 0.6 to 0.3 reduces the shear crack...approaches to engineering practice, 1201 D. Farkas, M. Rangaswamy and I . Singer, in Ion Implatation and Ion Beam Processing of Materials. cds

  9. Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth

    International Nuclear Information System (INIS)

    Tsuji, Hiroshi; Sato, Hiroko; Baba, Takahiro; Ikemura, Shin'ichi; Gotoh, Yasuhito; Ishikawa, Junzo

    2000-01-01

    A new method to control the position of neuron cell attachment and extension region of neural outgrowth has been developed by using a pattering ion implantation with silver-negative ions into polystyrene dishes. This technique offers a promising method to form an artificially designed neural network in cell culture in vitro. Silver-negative ions were implanted into non-treated polystyrene dishes (NTPS) at conditions of 20 keV and 3x10 15 ions/cm 2 through a pattering mask, which had as many as 67 slits of 60 μm in width and 4 mm in length with a spacing of 60 μm. For cell culture in vitro, nerve cells of PC-12h (rat adrenal phechromocytoma) were used because they respond to a nerve growth factor (NGF). In the first 2 days in culture without NGF, we observed a selective cell attachment only to the ion-implanted region in patterning Ag - implanted polystyrene sample (p-Ag/NTPS). In another 2 days in culture with NGF, the nerve cells expanded neurites only over the ion-implanted region. For collagen-coated p-Ag/NTPS sample of which collagen was coated after the ion implantation (Collagen/p-Ag/NTPS), most nerve cells were also attached on the ion-implanted region. However, neurites expanded in both ion-implanted and unimplanted regions. The contact angle of NTPS decreased after the ion implantation from 86 deg. to 74 deg. . The region selectivity of neuron attachment and neurite extension is considered to be due to contact angle lowering by the ion implantation as radiation effect on the surface

  10. Surface modification of the hard metal tungsten carbide-cobalt by boron ion implantation

    International Nuclear Information System (INIS)

    Mrotchek, I.

    2007-01-01

    In the present thesis ion beam implantation of boron is studied as method for the increasement of the hardness and for the improvement of the operational characteristics of cutting tools on the tungsten carbide-cobalt base. For the boron implantation with 40 keV energy and ∼5.10 17 ions/cm 2 fluence following topics were shown: The incoerporation of boron leads to a deformation and remaining strain of the WC lattice, which possesses different stregth in the different directions of the elementary cell. The maximum of the deformation is reached at an implantation temperature of 450 C. The segregation of the new phases CoWB and Co 3 W was detected at 900 C implantation temperature. At lower temperatures now new phases were found. The tribological characteristics of WC-Co are improved. Hereby the maxiaml effect was measured for implantation temperatures from 450 C to 700 C: Improvement of the microhardness by the factor 2..2.5, improvement of the wear resistance by the factor 4. The tribological effects extend to larger depths than the penetration depth of the boron implantation profile. The detected property improvements of the hard metal H3 show the possibility of a practical application of boron ion implantation in industry. The effects essential for a wer decreasement are a hardening of the carbide phase by deformation of the lattice, a hardening of the cobalt binding material and the phase boundaries because of the formation of a solid solution of the implanted boron atoms in Co and by this a blocking of the dislocation movement and the rupture spreading under load

  11. Nanocrystalline SnO2 formation by oxygen ion implantation in tin thin films

    Science.gov (United States)

    Kondkar, Vidya; Rukade, Deepti; Kanjilal, Dinakar; Bhattacharyya, Varsha

    2018-03-01

    Metallic tin thin films of thickness 100 nm are deposited on fused silica substrates by thermal evaporation technique. These films are implanted with 45 keV oxygen ions at fluences ranging from 5 × 1015 to 5 × 1016 ions cm-2. The energy of the oxygen ions is calculated using SRIM in order to form embedded phases at the film-substrate interface. Post-implantation, films are annealed using a tube furnace for nanocrystalline tin oxide formation. These films are characterized using x-ray diffraction, Raman spectroscopy, UV-vis spectroscopy and photoluminescence spectroscopy. XRD and Raman spectroscopy studies reveal the formation of single rutile phase of SnO2. The size of the nanocrystallites formed decreases with an increase in the ion fluence. The nanocrystalline SnO2 formation is also confirmed by UV-vis and photoluminescence spectroscopy.

  12. Planar waveguides in Yb3+-doped tellurite glasses fabricated by ion implantation of oxygen

    Science.gov (United States)

    Liu, Chun-Xiao; Xu, Jun; Zhou, Zhi-Guang; Fu, Li-Li; Zheng, Rui-Lin; Li, Wei-Nan; Guo, Hai-Tao; Lin, She-Bao; Wei, Wei

    2015-04-01

    A planar waveguide is demonstrated in the Yb3+-doped tellurite glass, using (5+6) MeV O3+ ion implantation with doses of (4+8)×1014 ions/cm2. The implantation process of O3+ ions into the Yb3+-doped tellurite glass is simulated by the stopping and range of ions in matter (SRIM) 2010 code. The dark-mode spectra are measured by the prism-coupling system at λ = 632.8 nm. The reflectivity calculation method and the finite-difference beam propagation method are used to calculate the refractive index profile and the modal profile of transverse electric (TE) mode of the fabricated waveguide, respectively. The absorption spectra show that the transmission properties are not affected by the waveguide fabrication process.

  13. I. Heteroepitaxy on Silicon. I. Ion Implantation in Silicon and Heterostructures

    Science.gov (United States)

    Bai, Gang

    The themes of this thesis, heteroepitaxy and ion implantation, are two areas that have been very actively researched in the last two decades. Heterostructures made of III-V compound semiconductors by MBE and OMVPE have been used extensively in the fabrication of optoelectronics devices such as high-speed transistors and semiconductor lasers. Heterostructures on Si, which is the focus of part I of this thesis, have the advantage of compatibility with Si-based VLSI and promise to have impact on the microelectronics industry. Studies on the structural, elastic, thermal, and electrical properties of heteroepitaxial CoSi_2, ReSi _2, and GeSi films grown on Si constitute the backbone of this thesis. Some new characteristics of heterostructures were discovered as a result of this investigation. Among them are the observation and modeling of misorientation effects on an epitaxial film grown on a vicinal substrate; the misorientation induced by interfacial misfit dislocation arrays; the experimental measurements and phenomenological analysis of thermal strain, dislocation generation, and strain relaxation; and illustrative measurements of elastic, thermal, and structural properties of epitaxial films. Ion implantation is an important process in the fabrication of integrated circuits. The second part of this thesis deals with the production and annealing of damage produced by ion implantation in semiconductors. The defect production, stability, microstructure, and the induced strain in implanted bulk Si crystals were quantitatively investigated as a function of ion species, dose, and implantation temperature. Many new features, such as the rapid rise of damage near the amorphization threshold, the correlation between the strain and defect concentration, and the scaling behavior of the damage with ion species and implantation temperature, are revealed. The last chapter concerns the effects of ion implantation in CoSi_2, ReSi_2 , and GeSi/Si heterostructures, which is a

  14. The formation of silver metal nanoparticles by ion implantation in silicate glasses

    Czech Academy of Sciences Publication Activity Database

    Vytykačová, S.; Švecová, B.; Nekvindová, P.; Špirková, J.; Macková, Anna; Mikšová, Romana; Bottger, R.

    2016-01-01

    Roč. 371, MAR (2016), s. 245-255 ISSN 0168-583X. [22nd International conference on Ion Beam Analysis (IBA). Opatija, 14.06.2015-19.06.2015] R&D Projects: GA MŠk(CZ) LM2011019; GA ČR GA15-01602S Institutional support: RVO:61389005 Keywords : silicate glass es * silver nanoparticles * ion implantation Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.109, year: 2016

  15. Variable-temperature sample system for ion implantation at -192 to +5000C

    International Nuclear Information System (INIS)

    Fuller, C.T.

    1978-04-01

    A variable-temperature sample system based on exchange-gas coupling was developed for ion-implantation use. The sample temperature can be controlled from -192 0 C to +500 0 C with rapid cooling. The system also has provisions for focusing and alignment of the ion beam, electron suppression, temperature monitoring, sample current measuring, and cryo-shielding. Design considerations and operating characteristics are discussed. 5 figures

  16. Studies on the surface modification of TiN coatings using MEVVA ion implantation with selected metallic species

    International Nuclear Information System (INIS)

    Ward, L.P.; Purushotham, K.P.; Manory, R.R.

    2016-01-01

    Highlights: • Reduced surface roughness was observed after ion implantation. • W implantation increased residual stress. • Reduced friction and wear accompanied Mo implantation. • Mo implanted layer was more resistant to breakdown during wear testing. • Ion implantation effects can be complex on various implanting species properties. - Abstract: Improvement in the performance of TiN coatings can be achieved using surface modification techniques such as ion implantation. In the present study, physical vapor deposited (PVD) TiN coatings were implanted with Cr, Zr, Nb, Mo and W using the metal evaporation vacuum arc (MEVVA) technique at a constant nominal dose of 4 × 10 16 ions cm −2 for all species. The samples were characterized before and after implantation, using Rutherford backscattering (RBS), glancing incident angle X-ray diffraction (GIXRD), atomic force microscopy (AFM) and optical microscopy. Friction and wear studies were performed under dry sliding conditions using a pin-on-disc CSEM Tribometer at 1 N load and 450 m sliding distance. A reduction in the grain size and surface roughness was observed after implantation with all five species. Little variation was observed in the residual stress values for all implanted TiN coatings, except for W implanted TiN which showed a pronounced increase in compressive residual stress. Mo-implanted samples showed a lower coefficient of friction and higher resistance to breakdown during the initial stages of testing than as-received samples. Significant reduction in wear rate was observed after implanting with Zr and Mo ions compared with unimplanted TiN. The presence of the Ti 2 N phase was observed with Cr implantation.

  17. Defect production in ion-implanted yttria-stabilized zirconia investigated by positron depth profiling

    Energy Technology Data Exchange (ETDEWEB)

    Saude, S.; Grynszpan, R.I.; Anwand, W.; Brauer, G

    2004-11-17

    The presence and evolution of free-volume defects induced during ion-implantation in solids can be a critical issue in micro- and nano-technology processes. Using a slow positron beam and measuring the energy-line Doppler broadening (DB) of the annihilation radiation, sub-surface investigations were carried out on single crystals of yttria-fully stabilized zirconia (Y-FSZ), following implantation of 210 keV oxygen-ions at fluences ranging from 1.0 x 10{sup 13} to 2.5 x 10{sup 16} cm{sup -2}. Depth profiles of the DB-lineshape S reveal a defect peak at 60 % of the oxygen-ion projected range R{sub p}, i.e., closer to the surface than the vacancy distribution derived from Monte-Carlo calculations. The S-dependence on the fluence exhibits three defect-production stages already identified after implantation with noble gas ions. The intermediate stage (0.1-1 displacements per atom (dpa)) displays a trapping saturation plateau, which rises with increasing ion mass, suggesting a specific critical size for the relevant dominant defect. A slight drop in defect concentration that follows indicates that defects of the last stage (above 2 dpa), are formed at the expense of former ones. No particular effect due to the self-ion is found.

  18. Present developments of research MeV Pelletron ion implantation systems

    Science.gov (United States)

    Norton, G. A.; Daniel, R. E.; Loger, R. L.; Schroeder, J. B.

    1989-02-01

    National Electrostatics Corp. has manufactured 79 ion beam systems. 17 of these Pelletron systems were designed with MeV ion implantation capability as a primary objective. Of these system, 8 were designed specifically for production ion implantation with a maximum beam energy of 4 MeV. For research applications, ion beam masses from carbon through gold have been accelerated with a maximum observed energy of 38 MeV from a 3 MV tandem S-series Pelletron. This paper will present performance charts which describe the observed ion beam capabilities of existing 3 MV tandem Pelletrons. In addition, the performance of the new high current, four charging chain, S-Series accelerator, currently in manufacture, will be given. A new 4 MV tandem S-Series Pelletron has been proposed, its expected capabilities will be stated. The NEC electrostatics raster scanner which is in use for MeV implantation provides uniform deposition at a maximum scan angle of ± 3.0 ° for 4 MeV doubly charged ions. The output wave form at ±10 kV scanning potential will be shown.

  19. Electronic Transport and Raman Spectroscopy Characterization in Ion-Implanted Highly Oriented Pyrolytic Graphite

    Science.gov (United States)

    de Jesus, R. F.; Turatti, A. M.; Camargo, B. C.; da Silva, R. R.; Kopelevich, Y.; Behar, M.; Balzaretti, N. M.; Gusmão, M. A.; Pureur, P.

    2018-02-01

    We report on Raman spectroscopy, temperature-dependent in-plane resistivity, and in-plane magnetoresistance experiments in highly oriented pyrolytic graphite (HOPG) implanted with As and Mn. A pristine sample was also studied for comparison. Two different fluences were applied, φ = 0.5× 10^{16} {ions}/{cm}2 and φ = 1.0× 10^{16} {ions}/{cm}2. The implantations were carried out with 20 keV ion energy at room temperature. The Raman spectroscopy results reveal the occurrence of drastic changes of the HOPG surface as a consequence of the damage caused by ionic implantation. For the higher dose, the complete amorphization limit is attained. The resistivity and magnetoresistance results were obtained placing electrical contacts on the irradiated sample surface. Owing to the strong anisotropy of HOPG, the electrical current propagates mostly near the implanted surface. Shubnikov-de Haas (SdH) oscillations were observed in the magnetoresistance at low temperatures. These results allow the extraction of the fundamental SdH frequencies and the carriers' effective masses. In general, the resistivity and magnetoresistance results are consistent with those obtained from Raman measurements. However, one must consider that the electrical conduction in our samples occurs as in a parallel association of a largely resistive thin sheet at the surface strongly modified by disorder with a thicker layer where damage produced by implantation is less severe. The SdH oscillations do not hint to significant changes in the carrier density of HOPG.

  20. Tuning of the electronic structure and magnetic properties of xenon ion implanted zinc oxide

    Science.gov (United States)

    Ghosh, B.; Ray, Sekhar C.; Pattanaik, Shreenu; Sarma, Sweety; Mishra, Dilip K.; Pontsho, Mbule; Pong, W. F.

    2018-03-01

    A correlation between the electronic structure and magnetic properties of ZnO single crystals (ZnO SCs) and 300 keV xenon ion (Xe3+) implanted ZnO SCs has been studied using x-ray absorption near edge structure (XANES) spectroscopy, valence band photoemission spectroscopy (VB-PES), x-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and a superconducting quantum interference device-type magnetometer. The XANES studies revealed that the number of unoccupied p-states in the implanted ZnO SCs is higher than in the pristine ZnO SCs. In the implanted ZnO SCs, the binding energy of the Zn 2p 3/2 core level peak shifted to higher energy which further confirmed the increase in the valence band maximum (VBM) energy level. The VBM of the xenon ion (Xe3+) implanted ZnO SCs increased from 3.17–3.49 eV, obtained from UPS (He-I) measurements. A VB-PES study revealed that the number of electrons in the valence band of the O 2p–Zn 4sp hybridized states of the implanted ZnO SCs is higher than in the pristine ZnO SCs. The magnetic M–H loops demonstrated enhanced room temperature ferromagnetism in the Xe implanted ZnO SCs, attributable to the increasing number of surface defects and native defect sites in oxygen vacancies and zinc interstitials.

  1. Characterization of PEEK, PET and PI implanted with Mn ions and sub-sequently annealed

    International Nuclear Information System (INIS)

    Mackova, A.; Malinsky, P.; Miksova, R.; Pupikova, H.; Khaibullin, R.I.; Slepicka, P.; Gombitová, A.; Kovacik, L.; Svorcik, V.; Matousek, J.

    2014-01-01

    Polyimide (PI), polyetheretherketone (PEEK) and polyethylene terephthalate (PET) foils were implanted with 80 keV Mn + ions at room temperature at fluencies of 1.0 × 10 15 –1.0 × 10 16 cm −2 . Mn depth profiles determined by RBS were compared to SRIM 2012 and TRIDYN simulations. The processes taking place in implanted polymers under the annealing procedure were followed. The measured projected ranges R P differ slightly from the SRIM and TRIDYN simulation and the depth profiles are significantly broader (up to 2.4 times) than those simulated by SRIM, while TRIDYN simulations were in a reasonable agreement up to the fluence 0.5 × 10 16 in PEEK. Oxygen and hydrogen escape from the implanted layer was examined using RBS and ERDA techniques. PET, PEEK and PI polymers exhibit oxygen depletion up to about 40% of its content in virgin polymers. The compositional changes induced by implantation to particular ion fluence are similar for all polymers examined. After annealing no significant changes of Mn depth distribution was observed even the further oxygen and hydrogen desorption from modified layers appeared. The surface morphology of implanted polymers was characterized using AFM. The most significant change in the surface roughness was observed on PEEK. Implanted Mn atoms tend to dissipate in the polymer matrix, but the Mn nanoparticles are too small to be observed on TEM micrographs. The electrical, optical and structural properties of the implanted and sub-sequently annealed polymers were investigated by sheet resistance measurement and UV–Vis spectroscopy. With increasing ion fluence, the sheet resistance decreases and UV–Vis absorbance increases simultaneously with the decline of optical band gap E g . The most pronounced change in the resistance was found on PEEK. XPS spectroscopy shows that Mn appears as a mixture of Mn oxides. Mn metal component is not present. All results were discussed in comparison with implantation experiment using the various ion

  2. Effects of ion implantation on corrosion of zirconium and zirconium base alloys

    International Nuclear Information System (INIS)

    Zelenskij, V.F.; Petel'guzov, I.A.; Rekova, L.P.; Rodak, A.G.

    1989-01-01

    The influence of He and Ar ion bombardment on the corrosion of Zr and Zr-1%Nb and Zr-2.5%Nb alloys is investigated with the aims of finding the irradiation influence laws, obtaining the dependences of the effect of increasing the corrosiuon resistance on the type and dose of bombarding ions and of finding the conditions for the maximum effect. The prolonged corrosion test of specimens (3500 hours) have shown that the strongest effect is obtained for the irradiation with Ar ions up to the dose 1x10 16 ion/cm 2 . The kinetics of ion thermosorption after corrosion of irradiated materials is studied, the temperature threshold of implanted ion stability in zirconium and its alloys is found to be 400 deg C

  3. Distribution of implanted ions in seeds and roots of mung bean

    International Nuclear Information System (INIS)

    Liu Donghua; Wang Wei; Jiang Wusheng; Zhang Zhixiang; Hou Wenqiang; Guo Ximing; Li Yi

    1998-01-01

    Doses of 1 x 10 16 , and 2 x 10 16 cm -2 and 1 x 10 16 , 2 x 10 16 , 3 x 10 16 and 3.6 x 10 16 cm -2 for iron and copper ions are implanted in dry seeds of mung bean, respectively. The results show that the accumulated-copper and -iron ion amounts in the seeds and roots vary with different doses of ion beam, and the fresh and dry weights of the roots decrease progressively with increasing iron and copper doses, except the treatment of 1 x 10 16 Cu + ions/cm 2 , and the accumulated-copper and -iron ion amounts in the seeds of the different test groups can be correlated with the ion distribution in the roots

  4. Application of laser produced plasmas for ion implantation techniques

    International Nuclear Information System (INIS)

    Hora, H.

    2005-01-01

    While all the classical ion sources, even the most advanced one like MEVVA of ECR sources, have space charge limited ion emission current densities of less than some mA per square centimeter, it is well known that laser driven ion sources are by many orders of magnitude different. After the well known phenomenon of very energetic highly charged fast ions, separated by their charge number Z, can all be explained now by the same mechanisms lead to 10.000 times higher ion current densities than in the classical case. For the opening of a systematic experimental clarification, we discuss the relevant theory. Another recent observation is analyzed why picosecond laser pulses result in the mentioned high ion energies only, if a prepulse is used. This has consequences to sub-picosecond laser-plasma interaction for the studies of the fast ignitor physics for laser fusion and for the new field of nuclear physics opened by these laser pulses producing up to 100 MeV particles and gammas of high density. (author)

  5. Optical properties of K9 glass waveguides fabricated by using carbon-ion implantation

    Science.gov (United States)

    Liu, Chun-Xiao; Wei, Wei; Fu, Li-Li; Zhu, Xu-Feng; Guo, Hai-Tao; Li, Wei-Nan; Lin, She-Bao

    2016-07-01

    K9 glass is a material with promising properties that make it attractive for optical devices. Ion implantation is a powerful technique to form waveguides with controllable depth and refractive index profile. In this work, optical planar waveguide structures were fabricated in K9 glasses by using 6.0-MeV C3+-ion implantation with a fluence of 1.0 × 1015 ions/cm2. The effective refractive indices of the guided modes were measured by using a prism-coupling system. The refractive index change in the ion-irradiated region was simulated by using the intensity calculation method. The modal intensity profile of the waveguide was calculated and measured by using the finite difference beam propagation method and the end-face coupling technique, respectively. The transmission spectra before and after the implantation showed that the main absorption band was not influenced by the low fluence dopants. The optical properties of the carbon-implanted K9 glass waveguides show promise for use as integrated photonic devices.

  6. Comparison of boron and neon damage effects in boron ion-implanted resistors

    International Nuclear Information System (INIS)

    MacIver, B.A.

    1975-01-01

    Boron and neon damage implants were used in fabricating integrated-circuit resistors in silicon. Resistor properties were studied as functions of damaging ion species and dose. Sheet resistances in the 10 000 Ω/square range were obtained with low temperature and voltage sensitivities and d.c. isolation. (author)

  7. Synthesis and screening of materials libraries of buried compound semiconductors by ion beam implantation

    OpenAIRE

    Stritzker, Bernd

    2004-01-01

    Synthesis and screening of materials libraries of buried compound semiconductors by ion beam implantation / I. Großhans, H. Karl and B. Stritzker. - In: Combinatorial and artificial intelligence methods in materials science II : symposium held December 1 - 4, 2003, Boston, Massachusetts, USA / ed.: Radislav A. Potyrailo ... - Warrendale, Pa. : Materials Research Society, 2004. - (Materials Research Society symposium proceedings ; 804)

  8. Blistering in alloy Ti–6Al–4V from H + ion implantation

    Indian Academy of Sciences (India)

    6Al–4V, was studied, following H+ ion implantation of 150 keV and 250 keV energy to fluence of 2.6 × 1018 cm-2 and 2.5 × 1019 cm-2, respectively at ambient temperature. No detectable change was observed in surface features of either of the ...

  9. (n,p) emission channeling measurements on ion-implanted beryllium

    CERN Multimedia

    Jakubek, J; Uher, J

    2007-01-01

    We propose to perform emission-channeling measurements using thermal neutron induced proton emission from ion-implanted $^{7}$Be. The physics questions addressed concern the beryllium doping of III-V and II-VI semiconductors and the host dependence of the electron capture half-life of $^{7}$Be.

  10. Compositional alteration of polyimide under high fluence implantation by Co+ and Fe+ ions

    Czech Academy of Sciences Publication Activity Database

    Popok, V. N.; Khaibullin, R. I.; Tóth, A.; Beshliu, V.; Hnatowicz, Vladimír; Macková, Anna

    2003-01-01

    Roč. 532, - (2003), s. 1034-1039 ISSN 0039-6028 R&D Projects: GA ČR GA102/01/1324 Institutional research plan: CEZ:AV0Z1048901 Keywords : ion implantation * radiation damage Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 2.063, year: 2003

  11. A Mutant of Bacillus Subtilis with High-Producing Surfactin by Ion Beam Implantation

    International Nuclear Information System (INIS)

    Liu Qingmei; Yuan Hang; Wang Jun; Gong Guohong; Zhou Wei; Fan Yonghong; Wang Li; Yao Jianming; Yu Zengliang

    2006-01-01

    In order to generate a mutant of Bacillus subtilis with enhanced surface activity through low energy nitrogen ion beam implantation, the effects of energy and dose of ions implanted were studied. The morphological changes in the bacteria were observed by scanning electron microscope (SEM). The optimum condition of ions implantation, 20 keV of energy and 2.6x10 15 N + /cm 2 in dose, was determined. A mutant, B.s-E-8 was obtained, whose surface activity of 50-fold and 100-fold diluted cell-free Landy medium was as 5.6-fold and 17.4-fold as the wild strain. The microbial growth and biosurfactant production of both the mutant and the wild strain were compared. After purified by ultrafiltration and SOURCE 15PHE, the biosurfactant was determined to be a complex of surfactin family through analysis of electrospray ionization mass spectrum (ESI/MS) and there was an interesting finding that after the ion beam implantation the intensities of the components were different from the wild type strain

  12. Modification of the iron mechanical- and corrosion features by ion implantation in surface

    International Nuclear Information System (INIS)

    Baumvol, I.J.R.

    1981-01-01

    The physical mechanisms responsable by the tin ion implantation in the iron surface at moderated doses are studied. Several techniques are used such as alpha-particle Rutherford backscattering, conversion electron Moessbauer spectroscopy and scanning electron microscopy. (L.C.) [pt

  13. Nano-size metallic oxide particle synthesis in Fe-Cr alloys by ion implantation

    Science.gov (United States)

    Zheng, C.; Gentils, A.; Ribis, J.; Borodin, V. A.; Delauche, L.; Arnal, B.

    2017-10-01

    Oxide Dispersion Strengthened (ODS) steels reinforced with metal oxide nanoparticles are advanced structural materials for nuclear and thermonuclear reactors. The understanding of the mechanisms involved in the precipitation of nano-oxides can help in improving mechanical properties of ODS steels, with a strong impact for their commercialization. A perfect tool to study these mechanisms is ion implantation, where various precipitate synthesis parameters are under control. In the framework of this approach, high-purity Fe-10Cr alloy samples were consecutively implanted with Al and O ions at room temperature and demonstrated a number of unexpected features. For example, oxide particles of a few nm in diameter could be identified in the samples already after ion implantation at room temperature. This is very unusual for ion beam synthesis, which commonly requires post-implantation high-temperature annealing to launch precipitation. The observed particles were composed of aluminium and oxygen, but additionally contained one of the matrix elements (chromium). The crystal structure of aluminium oxide compound corresponds to non-equilibrium cubic γ-Al2O3 phase rather than to more common corundum. The obtained experimental results together with the existing literature data give insight into the physical mechanisms involved in the precipitation of nano-oxides in ODS alloys.

  14. Capacitance-voltage characteristics of GaAs ion-implanted structures

    Directory of Open Access Journals (Sweden)

    Privalov E. N.

    2008-08-01

    Full Text Available A noniterative numerical method is proposed to calculate the barrier capacitance of GaAs ion-implanted structures as a function of the Schottky barrier bias. The features of the low- and high-frequency capacitance-voltage characteristics of these structures which are due to the presence of deep traps are elucidated.

  15. Simple fabrication of back contact heterojunction solar cells by plasma ion implantation

    Science.gov (United States)

    Koyama, Koichi; Yamaguchi, Noboru; Hironiwa, Daisuke; Suzuki, Hideo; Ohdaira, Keisuke; Matsumura, Hideki

    2017-08-01

    A back-contact amorphous-silicon (a-Si)/crystalline silicon (c-Si) heterojunction is one of the most promising structures for high-efficiency solar cells. However, the patterning of back-contact electrodes causes the increase in fabrication cost. Thus, to simplify the fabrication of back-contact cells, we attempted to form p-a-Si/i-a-Si/c-Si and n-a-Si/i-a-Si/c-Si regions by the conversion of a patterned area of p-a-Si/i-a-Si/c-Si to n-a-Si/i-a-Si/c-Si by plasma ion implantation. It is revealed that the conversion of the conduction type can be realized by the plasma ion implantation of phosphorus (P) atoms into p-a-Si/i-a-Si/c-Si regions, and also that the quality of passivation can be kept sufficiently high, the same as that before ion implantation, when the samples are annealed at around 250 °C and also when the energy and dose of ion implantation are appropriately chosen for fitting to a-Si layer thickness and bulk c-Si carrier density.

  16. Room-temperature vacancy migration in crystalline Si from an ion-implanted surface layer

    DEFF Research Database (Denmark)

    Larsen, Arne Nylandsted; Christensen, Carsten; Petersen, Jon Wulff

    1999-01-01

    examined, the vacancies migrate to a maximum depth of about 1 µm and at least one vacancy per implanted Ge ion migrates into the silicon crystal. The annealing of the E centers is accompanied, in an almost one-to-one fashion, by the appearance of a new DLTS line corresponding to a level at EC...

  17. Strongly asymmetric doping profiles at mask edges in high energy ion implantation

    NARCIS (Netherlands)

    Wijburg, R.C.M.; Wijburg, Rutger C.; Hemink, Gertjan; Hemink, Gertjan J.; Middelhoek, J.; Middelhoek, Jan

    1990-01-01

    The application of high-energy ion implantation is restricted by an asymmetric doping profile at the mask edges. As a result, buried interconnect cannot easily be formed. Moreover, the holding voltage and threshold voltage of CMOS-processes with retrograde wells may be strongly affected by this

  18. Development of Linear Mode Detection for Top-down Ion Implantation of Low Energy Sb Donors

    Science.gov (United States)

    Pacheco, Jose; Singh, Meenakshi; Bielejec, Edward; Lilly, Michael; Carroll, Malcolm

    2015-03-01

    Fabrication of donor spin qubits for quantum computing applications requires deterministic control over the number of implanted donors and the spatial accuracy to within which these can be placed. We present an ion implantation and detection technique that allows us to deterministically implant a single Sb ion (donor) with a resulting volumetric distribution of performed, in part, at the Center for Integrated Nanotechnologies, a U.S. DOE Office of Basic Energy Sciences user facility. The work was supported by Sandia National Laboratories Directed Research and Development Program. Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation, a Lockheed-Martin Company, for the U. S. Department of Energy under Contract No. DE-AC04-94AL85000.

  19. Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process

    International Nuclear Information System (INIS)

    Wu Hongchen; Zhang Huafang; Peng Liping; Jiang Yanli; Ma Guojia

    2004-01-01

    The Plasma Immersion Ion Implantation and Deposition (PIII and D) process has many advantages over the pure plasma immersion ion implantation or deposition. It can compensate for or eliminate the disadvantages of the shallow modification layer (for PIII) and increase the bond strength of the coating (of deposition). For this purpose, a new type of microwave plasma source used in the PIII and D process was developed, composed of a vacuum bend wave guide and a special magnetic circuit, so that the coupling window was protected from being deposited with a coating and bombarded by high-energy particles. So the life of the window is increased. To enhance the bonding between the coating and substrate a new biasing voltage is applied to the work piece so that the implantation and deposition (or hybrid process) can be completed in one vacuum cycle

  20. Research on the Distant Hybrids of Wheat Obtained via Low-Energy Ion-Beam Implantation

    Science.gov (United States)

    Chang, Shouwei; Cheng, Yuhong; Qin, Guangyong; Su, Mingjie

    2003-06-01

    The whole DNA of soybean was implanted into four varieties of wheat of Zhongyu 5, Huaiyin 9628, Wenyou 1, Jimai 5 respectively via ion-beam mediation. There were 5 plants obtained whose protein content was higher than 18.5%, the highest one was 21.44%. There were 3 plants obtained whose protein content was lower than 11.5%, the lowest one was 10.96%. We can see that the whole DNA of soybean transformed into wheat via ion beam implantation can induce the increase in wheat protein content dramatically. The result also shows that the transformation efficiency of different gene types of wheat receptor varies greatly that the implanting time has a certain effect on the efficiency of transformation.

  1. Accelerator based synthesis of hydroxyapatite by MeV ion implantation

    International Nuclear Information System (INIS)

    Rautray, Tapash R.; Narayanan, R.; Kwon, Tae-Yub; Kim, Kyo-Han

    2010-01-01

    Accelerator based MeV ion implantation of Ca 2+ and P 2+ into the titanium substrate to form hydroxyapatite (HA) has been carried out. Calcium hydroxide was formed after heating the calcium implanted titanium in air at 80 o C for 3 h. Upon subsequent annealing for 5 min at 600 o C HA was formed on the surface. Penetration depth of the HA layer in this method is much higher as compared to keV ion implantation. By elemental analysis, Ca/P ratio of the HA was found to be 1.76 which is higher than the ideal 1.67. This higher Ca/P ratio is attributed to the higher penetration depth of the MeV technique used.

  2. Analysis of Accumulating Ability of Heavy Metals in Lotus (Nelumbo nucifera) Improved by Ion Implantation

    International Nuclear Information System (INIS)

    Zhang Jianhua; Wang Naiyan; Zhang Fengshou

    2012-01-01

    Heavy metals have seriously contaminated soil and water, and done harm to public health. Academician WANG Naiyan proposed that ion-implantation technique should be exploited for environmental bioremediation by mutating and breeding plants or microbes. By implanting N + into Taikonglian No.1, we have selected and bred two lotus cultivars, Jingguang No.1 and Jingguang No.2. The present study aims at analyzing the feasibility that irradiation can be used for remediation of soil and water from heavy metals. Compared with parent Taikonglian No.1, the uptaking and accumulating ability of heavy metals in two mutated cultivars was obviously improved. So ion implantation technique can indeed be used in bioremediation of heavy metals in soil and water, but it is hard to select and breed a cultivar which can remedy the soil and water from all the heavy metals.

  3. The effect of ion-implantation on germination of alfalfa under phenanthrene stress

    International Nuclear Information System (INIS)

    Huang Hong; Wang Naiyan; Huang Jianwei; Liu Xijian; Dou Junfeng; Du Yongchao; Li Shuairan

    2011-01-01

    To investigate mutagenic effects of polycyclic aromatic hydrocarbons (PAHs) degradation plant under phenanthrene stress and to test germination level of alfalfa after ion-implantation alfalfa seeds were irradiated with N + beam. The germination percentage and the root length distribution of alfalfa, which grew in environment with different mass fraction of phenanthrene was investigated, respectively. The results indicated that the relation of dose and germination rate was shown as 'saddle' curve characteristics. It was found that the 5 x 10 15 cm -2 would be the best dose of implantation. And the longest root length was about 10.32 cm. The experiment also showed phenanthrene would have inhibitive effect on germination percentage and root growth of alfalfa. The stress resistance of PAHs with alfalfa could be enhanced by ion implantation. (authors)

  4. Ion implantation of Cd and Ag into AlN and GaN

    CERN Document Server

    Miranda, Sérgio M C; Correia, João Guilherme; Vianden, Reiner; Johnston, Karl; Alves, Eduardo; Lorenz, Katharina

    2012-01-01

    GaN and AlN thin films were implanted with cadmium (Cd) or silver (Ag), to fluences ranging from 1×1013 to 1.7 × 1015 at/cm$^{2}$. The implanted samples were annealed at 950 ºC under flowing nitrogen. While implantation damage could be fully removed for the lowest fluences, for higher fluences the crystal quality was only partially recovered. For the high fluence samples the lattice site location of the ions was studied by Rutherford Backscattering/ channelling (RBS/C). Cd ions are found to be incorporated in substitutional cation sites (Al or Ga) while Ag is slightly displaced from this position. To further investigate the incorporation sites, Perturbed Angular Correlation (PAC) measurements were performed and the electric field gradients at the site of the probe nuclei were determined.

  5. Ion beam studies - part 4. The use of multiply-charged and polyatomic ions in an implantation accelerator

    International Nuclear Information System (INIS)

    Freeman, J.H.; Chivers, D.J.; Gard, G.A.

    1976-12-01

    Polyatomic and multiply-charged ion provide a convenient means of extending the energy range of an implanted accelerator. The molecular species are also of interest in certain special bombardment studies. This report considers some of the factors which affect the production and utilisation of such beams. It introduces the concepts of hetero- and auto-contamination, and particular attention is given to the modification of the charge or mass of the ions resulting from inelastic collisions in the various beams transport regions of the accelerator. (author)

  6. The influence of silver-ion doping using ion implantation on the luminescence properties of Er–Yb silicate glasses

    Czech Academy of Sciences Publication Activity Database

    Staněk, S.; Nekvindová, P.; Švecová, B.; Vytykáčová, S.; Míka, M.; Oswald, Jiří; Macková, Anna; Malinský, Petr; Špirková, J.

    2016-01-01

    Roč. 371, Mar (2016), s. 350-354 ISSN 0168-583X. [22nd International conference on Ion Beam Analysis (IBA). Opatija, 14.06.2015-19.06.2015] R&D Projects: GA MŠk LM2015056; GA ČR GA15-01602S Institutional support: RVO:68378271 ; RVO:61389005 Keywords : ion implantation * silicate glass * silver * nanoparticles * erbium Subject RIV: BM - Solid Matter Physics ; Magnetism; BG - Nuclear, Atomic and Molecular Physics, Colliders (UJF-V) Impact factor: 1.109, year: 2016

  7. Ion beam synthesis of IrSi3 by implantation of 2 MeV Ir ions

    International Nuclear Information System (INIS)

    Sjoreen, T.P.; Chisholm, M.F.; Hinneberg, H.J.

    1992-11-01

    Formation of a buried IrSi 3 layer in (111) oriented Si by ion implantation and annealing has been studied at an implantation energy of 2 MeV for substrate temperatures of 450--550C. Rutherford backscattering (RBS), ion channeling and cross-sectional transmission electron microscopy showed that a buried epitaxial IrSi 3 layer is produced at 550C by implanting ≥ 3.4 x 10 17 Ir/cm 2 and subsequently annealing for 1 h at 1000C plus 5 h at 1100C. At a dose of 3.4 x 10 17 Ir/cm 2 , the thickness of the layer varied between 120 and 190 nm and many large IrSi 3 precipitates were present above and below the film. Increasing the dose to 4.4 x 10 17 Ir/cm 2 improved the layer uniformity at the expense of increased lattice damage in the overlying Si. RBS analysis of layer formation as a function of substrate temperature revealed the competition between the mechanisms for optimizing surface crystallinity vs. IrSi 3 layer formation. Little apparent substrate temperature dependence was evident in the as-implanted state but after annealing the crystallinity of the top Si layer was observed to deteriorate with increasing substrate temperature while the precipitate coarsening and coalescence improved

  8. Laser ion implantation of Ge in SiO2 using a post-ion acceleration system

    Czech Academy of Sciences Publication Activity Database

    Cutroneo, Mariapompea; Macková, Anna; Torrisi, L.; Lavrentiev, Vasyl

    2017-01-01

    Roč. 35, č. 1 (2017), s. 72-80 ISSN 0263-0346 R&D Projects: GA MŠk LM2015056; GA ČR(CZ) GBP108/12/G108 Institutional support: RVO:61389005 Keywords : laser ion implantation * post-acceleration Subject RIV: BH - Optics, Masers, Lasers OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 1.420, year: 2016

  9. A kinetic Monte Carlo annealing assessment of the dominant features from ion implant simulations

    International Nuclear Information System (INIS)

    Martin-Bragado, I.; Jaraiz, M.; Castrillo, P.; Pinacho, R.; Rubio, J.E.; Barbolla, J.

    2004-01-01

    Ion implantation and subsequent annealing are essential stages in today's advanced CMOS processing. Although the dopant implanted profile can be accurately predicted by analytical fits calibrated with SIMS profiles, the damage has to be estimated with a binary collision approximation implant simulator. Some models have been proposed, like the '+n', in an attempt to simplify the anneal simulation. We have used the atomistic kinetic Monte Carlo dados to elucidate which are the implant modeling features most relevant in the simulation of transient enhanced diffusion (TED). For the experimental conditions studied we find that the spatial correlation of the I, V Frenkel pairs is not critical in order to yield the correct I supersaturation, that can be simulated just taking into account the net I-V excess distribution. In contrast to, simulate impurity clustering/deactivation when there is an impurity concentration comparable to the net I-V excess, the full I and V profiles have to be used

  10. Optical, chemical and mechanical modifications induced by ion implantation on glass surfaces

    International Nuclear Information System (INIS)

    Chinellato, V.; Nicoletti, F.; Polato, P.; Gottardi, V.

    1982-01-01

    Soda-lime glasses have been implanted with 50 keV Ar ions. Modifications induced on the glass surface have been studied as a function of implanted dose, with particular regard to optical, chemical, and mechanical properties. Optical measurements indicate a reduction of the refractive index, connected to the surface sodium content. The sodium profile has been measured using the Na 23 (p,α)Ne 20 nuclear reaction. An improvement of the mechanical resistance has been observed at low implantation dose, together with a change of the chemical durability. An expansion of glass has been observed by S.E.M. and interferometric microscopy for 80 keV implantation energy. (author)

  11. Characterization of junctions produced by medium-energy ion implantation in silicon; Caracterisation de jonctions obtenues par implantation d'ions de moyenne energie dans le silicium

    Energy Technology Data Exchange (ETDEWEB)

    Monfret, A. [Commissariat a l' Energie Atomique, Grenoble (France). Centre d' Etudes Nucleaires

    1970-07-01

    Characteristics of diodes made by implanting 20 keV boron and phosphorus ions into silicon are reviewed. Special features of theses diodes are presented, and correlation with technology is studied. This paper includes three parts: - in the first part, the theory of range distribution is considered for both amorphous and single-crystal targets, - In the second part, a brief description of the experimental conditions is given. - In the third part, the experimental results are presented. The results lead to a schematic model of the component. They also show the influence of cleaning and annealing treatments from which optimized process of fabrication can be determined. In this study, the influence of a two stage annealing process is shown. For phosphorus and boron implants, the first stage is performed at 150 deg. C while the second stage is 450 deg. C for phosphorus and 550 deg. C for boron implants. The implanted diodes are found to exhibit good electrical characteristics. Comparisons with standard diffused diodes are quite favourable. (author) [French] On examine les caracteristiques de diodes obtenues par implantation d'ions bore et phosphore de 20 keV dans le silicium. On met en evidence le comportement particulier de ces diodes et on presente certaines correlations avec la technologie. L'expose comprend trois parties: - la premiere partie est consacree au calcul du profil de dopage en mode canalise ou non. - Dans la deuxieme partie, on decrit l'appareillage et les conditions experimentales d'implantation. - Dans la troisieme partie, on presente les resultats experimentaux. On propose un modele schematique pour expliquer le comportement des tenues en tension des diodes. L'etude des courants de fuite en fonction de la preparation des echantillons et des traitements thermiques permet de determiner des conditions optimales d'elaboration. Au cours de cette etude on met en evidence l'influence de deux stades de recuit: le premier a

  12. Simulation of in-plane distribution of beam irradiation amount in ion implantation

    International Nuclear Information System (INIS)

    Sone, Yuki; Sato, Masataka; Yamamoto, Yasuhiro

    1994-01-01

    In the ion implantation process which is one of the important technologies for making devices, the good controllability and the implantation in a short time aiming at high through put have been demanded. Therefore, the increase of current in implantation beam is planned, but such short time implantation is to worsen the uniformity of dose in wafer plane. The method of quantitatively determining this in-plane uniformity by computer simulation has been established, therefore, it is reported. In the simulation, the method of beam scan was made into raster scan, and the in-plane uniformity of dose was determined when the time of implantation, the with of overscan, and the band width of beam scanning waveform were taken as the parameters. As the result, in the case of assuming the scan waveform being ideal triangular wave, under the supposed condition, by taking the time of implantation as longer than 30s, the in-plane uniformity within 1% was able to be attained. It was found that the scanning device having 175 kHz band must be used for the above conditions. The simulation and as the results, the relation of the time of implantation with the in-plane uniformity, the scanning waveform and the in-plane uniformity and so on are reported. (K.I.)

  13. Seeding of silicon by copper ion implantation for selective electroless copper plating

    Energy Technology Data Exchange (ETDEWEB)

    Bhansali, S.; Sood, D.K.; Zmood, R.B. [Microelectronic and Materials Technology Centre, Royal Melbourne Institute of Technolgy, Melbourne, VIC (Australia)

    1993-12-31

    We report on the successful use of copper(self) ion implantation into silicon to seed the electroless plating of copper on silicon (100) surfaces. Copper ions have been implanted to doses of 5E14-6.4E16 ions/cm{sup 2} using a MEEVA ion implanter at extraction voltage of 40kV. Dose was varied in fine steps to determine the threshold dose of 2E15 Cu ions/cm{sup 2} for `seed` formation of copper films on silicon using a commercial electroless plating solution. Plated films were studied with Rutherford backscattering spectrometry, scanning electron microscopy, EDX and profilometry . The adhesion of films was measured by `scotch tape test`. The adhesion was found to improve with increasing dose. However thicker films exhibited rather poor adhesion and high internal stress. SEM results show that the films grow first as isolated islands which become larger and eventually impinge into a continuous film as the plating time is increased. (authors). 5 refs., 1 tab., 3 figs.

  14. Laser activation of Ultra Shallow Junctions (USJ) doped by Plasma Immersion Ion Implantation (PIII)

    Science.gov (United States)

    Vervisch, Vanessa; Larmande, Yannick; Delaporte, Philippe; Sarnet, Thierry; Sentis, Marc; Etienne, Hasnaa; Torregrosa, Frank; Cristiano, Fuccio; Fazzini, Pier Francesco

    2009-03-01

    Today, the main challenges for the realization of the source/drain extensions concern the ultra-low energy implantation and the activation of the maximum amount of dopants with a minimized diffusion. Among the different annealing processes, one solution is the laser thermal annealing. Many studies [F. Torregrosa, C. Laviron, F. Milesi, M. Hernandez, H. Faik, J. Venturini, Proc. 14th International Conference on Ion Implant Technology, 2004; M. Hernandez, J. Venturini, D. Zahorski, J. Boulmer, D. Débarre, G. Kerrien, T. Sarnet, C. Laviron, M.N Semeria, D. Camel, J.L Santailler, Appl. Surf. Sci. 208-209 (2003) 345-351] have shown that the association of Plasma Immersion Ion Implantation (PIII) and Laser Thermal Process (LTP) allows to obtain junctions of a few nanometers with a high electrical activation. All the wafers studied have been implanted by PULSION ® (PIII implanter developed by Ion Beam Services) with an acceleration voltage of 1 kV and a dose of 6 × 10 15 at./cm 2. In this paper, we compare the annealing process achieved with three excimer lasers: ArF, KrF and XeCl with a wavelength of respectively 193, 248 and 308 nm. We analyse the results in terms of boron activation and junction depth. To complete this study, we have observed the effect of pre-amorphization implantation (PAI) before PIII process on boron implantation and boron activation. We show that Ge PAI implanted by classical beam line allows a decrease of the junction depth from 20 down to 12 nm in the as-implanted condition. Transmission Electron Microscopy (TEM) analyses were performed in order to study the structure of pre-amorphized silicon and to estimate the thickness of the amorphous layer. In order to determine the sheet resistance ( Rs) and the junction depth ( Xj), we have used the four-point probe technique (4PP) and secondary ion mass spectrometry (SIMS) analysis. To complete the electrical characterizations some samples have been analyzed by non-contact optical measurements. All

  15. Study of the effect of reactive-element addition by implanting metal ions in a preformed oxide layer

    International Nuclear Information System (INIS)

    Hou, P.Y.; Brown, I.G.; Stringer, J.

    1991-01-01

    The influence of ion-implanted Y, Hf, Zr and Cr on the oxidation behavior of a Ni-25 wt.% Cr alloy at 1000degC has been investigated. The implantation dose was 5x10 16 ions/cm 2 . Two methods of implantation have been used. One was to implant ions directly into a clean alloy surface; the other was to implant into an approximately 0.6 μm thick Cr 2 O 3 layer formed at 1000degC on the alloy. In neither case did the Cr implantation show any beneficial effects. Implantations of Y, Hf and Zr produced all the reactive element effects, i.e. reduction in oxidation rate, elimination of base-metal oxide formation and improvement in scale adhesion, only if the ions were initially implanted in the alloy. When the ions were implanted into a preformed oxide, the subsequent oxidation process was altered to the same degree as before, but the scale adhesion was not affected. Implications of these results to the mechanism of the reactive-element effect are discussed. (orig.)

  16. Luminescent ultra-small gold nanoparticles obtained by ion implantation in silica

    Energy Technology Data Exchange (ETDEWEB)

    Cesca, T., E-mail: tiziana.cesca@unipd.it [Department of Physics and Astronomy and CNISM, University of Padova, via Marzolo 8, I-35131 Padova (Italy); Maurizio, C.; Kalinic, B.; Scian, C. [Department of Physics and Astronomy and CNISM, University of Padova, via Marzolo 8, I-35131 Padova (Italy); Trave, E.; Battaglin, G. [Department of Molecular Sciences and Nanosystems, Ca’ Foscari University of Venice, Dorsoduro 2137, I-30123 Venice (Italy); Mazzoldi, P.; Mattei, G. [Department of Physics and Astronomy and CNISM, University of Padova, via Marzolo 8, I-35131 Padova (Italy)

    2014-05-01

    The room temperature photoluminescence properties of ultra-small Au nanoclusters (made by 5–10 atoms) obtained by ion implantation in silica are presented. The results show a broad and intense luminescent emission in three different spectral regions around 750 nm, 980 nm and 1150 nm. The luminescence properties of the molecule-like Au clusters have been also correlated to the energy-transfer process to Er{sup 3+} ions in Au–Er co-implanted silica samples. A partial quenching of the 980 nm component is observed due to the Er{sup 3+} absorption level at 980 nm that acts as a de-excitation channel through which the photon energy is transferred from the Au nanoclusters to the Er ions, eventually producing the Er-related emission at 1.5 microns.

  17. Surface modification of PET film by plasma-based ion implantation

    International Nuclear Information System (INIS)

    Sakudo, N.; Mizutani, D.; Ohmura, Y.; Endo, H.; Yoneda, R.; Ikenaga, N.; Takikawa, H.

    2003-01-01

    It has been reported that thin diamond like carbon (DLC) coating is very Amsterdam, Theenhancing the barrier characteristics of polyethylene terephthalate (PET) against CO 2 and O 2 gases. However, coating technique has a problem of DLC-deposit peeling. In this research, we develop a new technique to change the PET surface into DLC by ion implantation instead of coating the surface with the DLC deposit. The surface of PET film is modified by plasma-based ion implantation using pulse voltages of 10 kV in height and 5 μs in width. Attenuated total reflection FT-IR spectroscopy shows that the specific absorption peaks for PET decrease with dose, that is, the molecules of ethylene terephthalate are destroyed by ion bombardment. Then, laser Raman spectroscopy shows that thin DLC layer is formed in the PET surface area

  18. Radiation damage in urania crystals implanted with low-energy ions

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Tien Hien, E-mail: tien-hien.nguyen@u-psud.fr [Centre de Sciences Nucléaires et de Sciences de la Matière (CSNSM – UMR 8609), CNRS-IN2P3-Université Paris-Sud, Bâtiments 104-108, 91405 Orsay Campus (France); Garrido, Frédérico; Debelle, Aurélien; Mylonas, Stamatis [Centre de Sciences Nucléaires et de Sciences de la Matière (CSNSM – UMR 8609), CNRS-IN2P3-Université Paris-Sud, Bâtiments 104-108, 91405 Orsay Campus (France); Nowicki, Lech [The Andrzej Soltan Institute for Nuclear Studies, Hoza 69, 00-681 Warsaw (Poland); Thomé, Lionel; Bourçois, Jérôme; Moeyaert, Jérémy [Centre de Sciences Nucléaires et de Sciences de la Matière (CSNSM – UMR 8609), CNRS-IN2P3-Université Paris-Sud, Bâtiments 104-108, 91405 Orsay Campus (France)

    2014-05-01

    Implantations with low-energy ions (470-keV Xe and 500-keV La with corresponding ion range Rp ∼ 85 nm and range straggling ΔRp ∼ 40 nm) have been performed to investigate both radiation and chemical effects due to the incorporation of different species in UO{sub 2} (urania) crystals. The presence of defects was monitored in situ after each implantation fluence step by the RBS/C technique. Channelling data were analysed afterwards by Monte-Carlo simulations with a model of defects involving (i) randomly displaced atoms (RDA) and (ii) distorted rows, i.e. bent channels (BC). While increasing the ion fluence, the accumulation of RDA leads to a steep increase of the defect fraction in the range from 4 to 7 dpa regardless of the nature of bombarding ions followed by a saturation plateau over a large dpa range. A clear difference of 6% in the yield of saturation plateaus between irradiation with Xe and La ions was observed. Conversely, the evolutions of the fraction of BC showed a similar regular increase with increasing ion fluence for both ions. Moreover, this increase is shifted to a larger fluence in comparison to the sharp increase step of RDA. This phenomenon indicates a continuous structural modification of UO{sub 2} crystals under irradiation unseen by the measurement of RDA.

  19. Residual stress in ion implanted titanium nitride studied by parallel beam glancing incidence x-ray diffraction

    International Nuclear Information System (INIS)

    Geist, D.E.; Perry, A.J.; Treglio, J.R.; Valvoda, V.; Rafaja, D.

    1995-01-01

    Ion implantation is known to increase the lifetime of cutting tools. Current theories are the increase in lifetime is caused by an increase in the residual stress, or by work hardening of the surface associated with the implantation. In this work the effect of ion implantation on the residual stress in titanium nitride coatings made by the standard industrial methods of chemical and physical vapor deposition (CVD and PVD) is studied. It is found in the as-received condition (unimplanted), the residual stress levels are near zero for CVD materials and highly compressive, of the order of 6 GPa, for PVD materials. Ion implantation has no effect on the residual stress in the coatings made by CVD. Nitrogen does increase the compressive residual stress by some 10% in the near surface regions of PVD coatings, while nickel-titanium dual metal ion implantation does not have any effect. It appears that the lifetime increase is not associated with residual stress effects

  20. Multi-energy ion implantation from high-intensity laser

    Czech Academy of Sciences Publication Activity Database

    Cutroneo, Mariapompea; Torrisi, L.; Ullschmied, Jiří; Dudžák, Roman

    2016-01-01

    Roč. 61, č. 2 (2016), s. 109-113 ISSN 0029-5922. [PLASMA 2015 : International Conference on Research and Applications of Plasmas. Warsaw, 07.09.2015-11.09.2015] R&D Projects: GA MŠk(CZ) LM2011019; GA ČR(CZ) GBP108/12/G108 Institutional support: RVO:61389021 ; RVO:61389005 Keywords : high-intensity laser * implantation * material modification Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders; BL - Plasma and Gas Discharge Physics (UFP-V) Impact factor: 0.760, year: 2016