Electrophoretic Deposition of Gallium with High Deposition Rate
Directory of Open Access Journals (Sweden)
Hanfei Zhang
2014-12-01
Full Text Available In this work, electrophoretic deposition (EPD is reported to form gallium thin film with high deposition rate and low cost while avoiding the highly toxic chemicals typically used in electroplating. A maximum deposition rate of ~0.6 μm/min, almost one order of magnitude higher than the typical value reported for electroplating, is obtained when employing a set of proper deposition parameters. The thickness of the film is shown to increase with deposition time when sequential deposition is employed. The concentration of Mg(NO32, the charging salt, is also found to be a critical factor to control the deposition rate. Various gallium micropatterns are obtained by masking the substrate during the process, demonstrating process compatibility with microfabrication. The reported novel approach can potentially be employed in a broad range of applications with Ga as a raw material, including microelectronics, photovoltaic cells, and flexible liquid metal microelectrodes.
High power pulsed magnetron sputtering: A method to increase deposition rate
International Nuclear Information System (INIS)
Raman, Priya; McLain, Jake; Ruzic, David N; Shchelkanov, Ivan A.
2015-01-01
High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed
Analysis of heating effect on the process of high deposition rate microcrystalline silicon
International Nuclear Information System (INIS)
Xiao-Dan, Zhang; He, Zhang; Chang-Chun, Wei; Jian, Sun; Guo-Fu, Hou; Shao-Zhen, Xiong; Xin-Hua, Geng; Ying, Zhao
2010-01-01
A possible heating effect on the process of high deposition rate microcrystalline silicon has been studied. It includes the discharge time-accumulating heating effect, discharge power, inter-electrode distance, and total gas flow rate induced heating effect. It is found that the heating effects mentioned above are in some ways quite similar to and in other ways very different from each other. However, all of them will directly or indirectly cause the increase of the substrate surface temperature during the process of depositing microcrystalline silicon thin films, which will affect the properties of the materials with increasing time. This phenomenon is very serious for the high deposition rate of microcrystalline silicon thin films because of the high input power and the relatively small inter-electrode distance needed. Through analysis of the heating effects occurring in the process of depositing microcrystalline silicon, it is proposed that the discharge power and the heating temperature should be as low as possible, and the total gas flow rate and the inter-electrode distance should be suitable so that device-grade high quality deposition rate microcrystalline silicon thin films can be fabricated
PECVD deposition of device-quality intrinsic amorphous silicon at high growth rate
Energy Technology Data Exchange (ETDEWEB)
Carabe, J [Inst. de Energias Renovables, CIEMAT, Madrid (Spain); Gandia, J J [Inst. de Energias Renovables, CIEMAT, Madrid (Spain); Gutierrez, M T [Inst. de Energias Renovables, CIEMAT, Madrid (Spain)
1993-11-01
The combined influence of RF-power density (RFP) and silane flow-rate ([Phi]) on the deposition rate of plasma-enhanced chemical vapour deposition (PECVD) intrinsic amorphous silicon has been investigated. The correlation of the results obtained from the characterisation of the material with the silane deposition efficiency, as deduced from mass spectrometry, has led to an interpretation allowing to deposit intrinsic amorphous-silicon films having an optical gap of 1.87 eV and a photoconductive ratio (ratio of ambient-temperature conductivities under 1 sun AM1 and in dark) of 6 orders of magnitude at growth rates up to 10 A/s, without any structural modification of the PECVD system used. Such results are considered of high relevance regarding industrial competitiveness. (orig.)
Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics
Energy Technology Data Exchange (ETDEWEB)
Anders, Andre
2009-11-22
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.
Deposition rates of high power impulse magnetron sputtering: Physics and economics
International Nuclear Information System (INIS)
Anders, Andre
2010-01-01
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.
High-deposition-rate ceramics synthesis
Energy Technology Data Exchange (ETDEWEB)
Allendorf, M.D.; Osterheld, T.H.; Outka, D.A. [Sandia National Laboratories, Livermore, CA (United States)] [and others
1995-05-01
Parallel experimental and computational investigations are conducted in this project to develop validated numerical models of ceramic synthesis processes. Experiments are conducted in the High-Temperature Materials Synthesis Laboratory in Sandia`s Combustion Research Facility. A high-temperature flow reactor that can accommodate small preforms (1-3 cm diameter) generates conditions under which deposition can be observed, with flexibility to vary both deposition temperature (up to 1500 K) and pressure (as low as 10 torr). Both mass spectrometric and laser diagnostic probes are available to provide measurements of gas-phase compositions. Experiments using surface analytical techniques are also applied to characterize important processes occuring on the deposit surface. Computational tools developed through extensive research in the combustion field are employed to simulate the chemically reacting flows present in typical industrial reactors. These include the CHEMKIN and Surface-CHEMKIN suites of codes, which permit facile development of complex reaction mechanisms and vastly simplify the implementation of multi-component transport and thermodynamics. Quantum chemistry codes are also used to estimate thermodynamic and kinetic data for species and reactions for which this information is unavailable.
International Nuclear Information System (INIS)
Kakiuchi, H.; Nakahama, Y.; Ohmi, H.; Yasutake, K.; Yoshii, K.; Mori, Y.
2005-01-01
Silicon nitride (SiN x ) films have been prepared at extremely high deposition rates by the atmospheric pressure plasma chemical vapor deposition (AP-PCVD) technique on Si(001) wafers from gas mixtures containing He, H 2 , SiH 4 and N 2 or NH 3 . A 150 MHz very high frequency (VHF) power supply was used to generate high-density radicals in the atmospheric pressure plasma. Deposition rate, composition and morphology of the SiN x films prepared with various deposition parameters were studied by scanning electron microscopy and Auger electron spectroscopy. Fourier transformation infrared (FTIR) absorption spectroscopy was also used to characterize the structure and the chemical bonding configurations of the films. Furthermore, etching rate with buffered hydrofluoric acid (BHF) solution, refractive index and capacitance-voltage (C-V) characteristics were measured to evaluate the dielectric properties of the films. It was found that effective passivation of dangling bonds and elimination of excessive hydrogen atoms at the film-growing surface seemed to be the most important factor to form SiN x film with a dense Si-N network. The C-V curve of the optimized film showed good interface properties, although further improvement was necessary for use in the industrial metal-insulator-semiconductor (MIS) applications
Malushin, N. N.; Valuev, Denis Viktorovich; Valueva, Anna Vladimirovna; Serikbol, A.; Borovikov, I. F.
2015-01-01
The authors study the influence of cooling rate in high-temperature area for thermal cycle of high-cutting chrome-tungsten metal weld deposit on the processes of carbide phase merging and austenite grain growth for the purpose of providing high hardness of deposited metal (HRC 64-66).
International Nuclear Information System (INIS)
Malushin, N N; Valuev, D V; Valueva, A V; Serikbol, A; Borovikov, I F
2015-01-01
The authors study the influence of cooling rate in high-temperature area for thermal cycle of high-cutting chrome-tungsten metal weld deposit on the processes of carbide phase merging and austenite grain growth for the purpose of providing high hardness of deposited metal (HRC 64-66). (paper)
Saager, Stefan; Ben Yaala, Marwa; Heinß, Jens-Peter; Temmler, Dietmar; Pfefferling, Bert; Metzner, Christoph
2014-01-01
In earlier electron beam physical vapor deposition tests (EB-PVD), using a conventional copper crucible (A), high Si deposition rates at relatively high EB power together with a contamination level of 1016 cm-3 are demonstrated. To improve the rate vs. EB power relation as well as the Si layer purity, two alternative high rate EBPVD methods are investigated and reported here - a contact-less crucible setup (B) and a crucible-free setup (C).In these experiments comparable deposition rates of ~...
International Nuclear Information System (INIS)
Sakai, Tetsuya; Kuniyoshi, Yuji; Aoki, Wataru; Ezoe, Sho; Endo, Tatsuya; Hoshi, Yoichi
2008-01-01
High-rate deposition of titanium dioxide (TiO 2 ) film was attempted using oxygen plasma assisted reactive evaporation (OPARE) method. Photocatalytic properties of the film were investigated. During the deposition, the substrate temperature was fixed at 400 deg. C. The film deposition rate can be increased by increasing the supply of titanium atoms to the substrate, although oversupply of the titanium atoms causes oxygen deficiency in the films, which limits the deposition rate. The film structure depends strongly on the supply ratio of oxygen molecules to titanium atoms O 2 /Ti and changes from anatase to rutile structure as the O 2 /Ti supply ratio increased. Consequently, the maximum deposition rates of 77.0 nm min -1 and 145.0 nm min -1 were obtained, respectively, for the anatase and rutile film. Both films deposited at such high rates showed excellent hydrophilicity and organic decomposition performance. Even the film with rutile structure deposited at 145.0 nm min -1 had a contact angle of less than 2.5 deg. by UV irradiation for 5.0 h and an organics-decomposition performance index of 8.9 [μmol l -1 min -1 ] for methylene blue
High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
Energy Technology Data Exchange (ETDEWEB)
Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)
2015-01-01
Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films.
High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
International Nuclear Information System (INIS)
Lisco, F.; Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G.; Losurdo, M.; Walls, J.M.
2015-01-01
Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films
van den Donker, M.N.; Schmitz, R.; Appenzeller, W.; Rech, B.; Kessels, W.M.M.; Sanden, van de M.C.M.
2006-01-01
A 13.56 MHz parallel plate hydrogen-dild. silane plasma, operated at high pressure and high power, was used to deposit microcryst. silicon solar cells with efficiencies of 6-9% at high deposition rates of 0.4-1.2 nm/s. In this regime new challenges arise regarding temp. control, since the high
Energy Technology Data Exchange (ETDEWEB)
Sobajima, Yasushi; Nishino, Mitsutoshi; Fukumori, Taiga; Kurihara, Masanori; Higuchi, Takuya; Nakano, Shinya; Toyama, Toshihiko; Okamoto, Hiroaki [Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, Toyonaka, Machikaneyama-cho 1-3, Osaka 560-8531 (Japan)
2009-06-15
Microcrystalline silicon ({mu}c-Si) films deposited at high growth rates up to 8.1 nm/s prepared by very-high-frequency-plasma-enhanced chemical vapor deposition (VHF-PECVD) at 18-24 Torr have been investigated. The relation between the deposition rates and input power revealed the depletion of silane. Under high-pressure deposition (HPD) conditions, the structural properties were improved. Furthermore, applying {mu}c-Si to n-i-p solar cells, short-circuit current density (J{sub SC}) was increased in accordance with the improvement of microstructure of i-layer. As a result, a conversion efficiency of 6.30% has been achieved employing the i-layer deposited at 8.1 nm/s under the HPD conditions. (author)
High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation
International Nuclear Information System (INIS)
Minami, Tadatsugu; Ida, Satoshi; Miyata, Toshihiro
2002-01-01
Transparent conducting oxide (TCO) thin films have been deposited at a high rate above 370 nm/min by vacuum arc plasma evaporation (VAPE) using sintered oxide fragments as the source material. It was found that the deposition rate of TCO films was strongly dependent on the deposition pressure, whereas the obtained electrical properties were relatively independent of the pressure. Resistivities of 5.6x10 -4 and 2.3x10 -4 Ω·cm and an average transmittance above 80% (with substrate included) in the visible range were obtained in Ga-doped ZnO (GZO) thin films deposited at 100 and 350 deg. C, respectively. In addition, a resistivity as low as 1.4x10 -4 Ω·cm and an average transmittance above 80% were also obtained in indium-tin-oxide (ITO) films deposited at 300 deg. C. The deposited TCO films exhibited uniform distributions of resistivity and thickness on large area substrates
High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation
Energy Technology Data Exchange (ETDEWEB)
Minami, Tadatsugu; Ida, Satoshi; Miyata, Toshihiro
2002-09-02
Transparent conducting oxide (TCO) thin films have been deposited at a high rate above 370 nm/min by vacuum arc plasma evaporation (VAPE) using sintered oxide fragments as the source material. It was found that the deposition rate of TCO films was strongly dependent on the deposition pressure, whereas the obtained electrical properties were relatively independent of the pressure. Resistivities of 5.6x10{sup -4} and 2.3x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% (with substrate included) in the visible range were obtained in Ga-doped ZnO (GZO) thin films deposited at 100 and 350 deg. C, respectively. In addition, a resistivity as low as 1.4x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% were also obtained in indium-tin-oxide (ITO) films deposited at 300 deg. C. The deposited TCO films exhibited uniform distributions of resistivity and thickness on large area substrates.
High-rate silicon nitride deposition for photovoltaics : from fundamentals to industrial application
Kessels, W.M.M.; Oever, van den P.J.; Bosch, R.C.M.; Bijker, M.D.; Evers, M.F.J.; Schram, D.C.; Sanden, van de M.C.M.
2005-01-01
The development of a novel plasma technique for high rate (> 1 nm/s) silicon nitride deposition for multifunctional antireflection coatings on crystalline silicon solar cells is described. The research has involved the analysis of the structural and optical properties of the silicon nitride films as
High-rate silicon nitride deposition for photovoltaics : from fundamentals to industrial application
Kessels, W.M.M.; Oever, van den P.J.; Bosch, R.C.M.; Bijker, M.D.; Evers, M.F.J.; Schram, D.C.; Sanden, van de M.C.M.
2004-01-01
The development of a novel plasma technique for high rate (> 1 nm/s) silicon nitride deposition for multifunctional antireflection coatings on crystalline silicon solar cells is described. The research has involved the analysis of the structural and optical properties of the silicon nitride films as
Yu, Lei; Wang, Guilong; Wan, Gengping; Wang, Guizhen; Lin, Shiwei; Li, Xinyue; Wang, Kan; Bai, Zhiming; Xiang, Yang
2016-09-21
In this work, we report an atomic layer deposition (ALD) method for the fabrication of NiO/CNT hybrid structures in order to improve electronic conductivity, enhance cycling stability and increase rate capability of NiO used as supercapacitor electrodes. A uniform NiO coating can be well deposited on carbon nanotubes (CNTs) through simultaneously employing O3 and H2O as oxidizing agents in a single ALD cycle of NiO for the first time, with a high growth rate of nearly 0.3 Å per cycle. The electrochemical properties of the as-prepared NiO/CNT were then investigated. The results show that the electrochemical capacitive properties are strongly associated with the thickness of the NiO coating. The NiO/CNT composite materials with 200 cycles of NiO deposition exhibit the best electrochemical properties, involving high specific capacitance (622 F g(-1) at 2 A g(-1), 2013 F g(-1) for NiO), excellent rate capability (74% retained at 50 A g(-1)) and outstanding cycling stability. The impressive results presented here suggest a great potential for the fabrication of composite electrode materials by atomic layer deposition applied in high energy density storage systems.
International Nuclear Information System (INIS)
Inayoshi, Muneto; Ikeda, Masanobu; Hori, Masaru; Goto, Toshio; Hiramatsu, Mineo; Hiraya, Atsunari.
1995-01-01
Both anisotropic ablation and thin film formation of polytetrafluoroethylene (PTFE) were successfully demonstrated using synchrotron radiation (SR) irradiation of PTFE, that is, the SR ablation process. Anisotropic ablation by the SR irradiation was performed at an extremely high rate of 3500 μm/min at a PTFE target temperature of 200degC. Moreover, a PTFE thin film was formed at a high rate of 2.6 μm/min using SR ablation of PTFE. The chemical structure of the deposited film was similar to that of the PTFE target as determined from Fourier transform infrared absorption spectroscopy (FT-IR) analysis. (author)
Energy Technology Data Exchange (ETDEWEB)
Oberbeck, L.; Schmidt, J.; Wagner, T.A.; Bergmann, R.B. [Stuttgart Univ. (Germany). Inst. of Physical Electronics
2001-07-01
Low-temperature deposition of Si for thin-film solar cells has previously been hampered by low deposition rates and low material quality, usually reflected by a low open-circuit voltage of these solar cells. In contrast, ion-assisted deposition produces Si films with a minority-carrier diffusion length of 40 {mu}m, obtained at a record deposition rate of 0.8 {mu}m/min and a deposition temperature of 650{sup o}C with a prebake at 810{sup o}C. A thin-film Si solar cell with a 20-{mu}m-thick epitaxial layer achieves an open-circuit voltage of 622 mV and a conversion efficiency of 12.7% without any light trapping structures and without high-temperature solar cell process steps. (author)
The effects of H sub 2 addition on the enhanced deposition rate and high quality Cu films by MOCVD
Lee, J H; Park, S J; Choi, S Y
1998-01-01
High-quality Cu thin films were deposited on the TiN/Si substrate from the hexafluoroacetylacetonate Copper thrmethylvinylsilane [Cu (hfac) (tmvs)] source using a metal organic chemical vapor deposition (MOCVD) technique. The optimum deposition condition is with a substrate temperature of 200 .deg. C and the hydrogen flow rate of 80 sccm. The deposition rate, electrical resistivity, surface morphology, grain size, and optical properties of the deposited Cu films were investigated by the AES, four-point probe, SEM, XRD, and the visible spectrophotometer as a function of hydrogen gas flow rate, The results indicated that additional hydrogen gas affects the CVD hydrogen reduction reaction improving the purity, deposition rate, and electrical resistivity of Cu thin films. A prospective idea will be discussed for the preparation of Cu thin films showing a more enhanced electromigration resistance applicable to the next-generation interconnection.
Energy Technology Data Exchange (ETDEWEB)
Persad, C.; Marcus, H.L.; Weldon, W.F.
1987-03-31
This exploratory research program was initiated to investigate the potential of using pulse power sources for powder consolidation, deposition and other high-energy high-rate processing. The characteristics of the high-energy-high-rate (1MJ/s) powder consolidation using megampere current pulses from a homopolar generator, were defined. Molybdenum Alloy TZM, a nickel-based metallic glass, copper/graphite composites, and P/M aluminum alloy X7091 were investigated. The powder-consolidation process produced high densification rates. Density values of 80% to 99% could be obtained with subsecond high-temperature exposure. Specific energy input and applied pressure were controlling process parameters. Time temperature transformation (TTT) concepts underpin a fundamental understanding of pulsed power processing. Inherent control of energy input, and time-to-peak processing temperature developed to be held to short times. Deposition experiments were conducted using an exploding-foil device (EFD) providing an armature feed to railgun mounted in a vacuum chamber. The material to be deposited - in plasma, gas, liquid, or solid state - was accelerated electromagnetically in the railgun and deposited on a substrate. Deposits of a wide variety of single- and multi-specie materials were produced on several types of substrates. In a series of ancillary experiments, pulsed-skin-effect heating and self quenching of metallic conductors was discovered to be a new means of surface modification by high-energy high-rate-processing.
The Influence of the Powder Stream on High-Deposition-Rate Laser Metal Deposition with Inconel 718
Directory of Open Access Journals (Sweden)
Chongliang Zhong
2017-10-01
Full Text Available For the purpose of improving the productivity of laser metal deposition (LMD, the focus of current research is set on increasing the deposition rate, in order to develop high-deposition-rate LMD (HDR-LMD. The presented work studies the effects of the powder stream on HDR-LMD with Inconel 718. Experiments have been designed and conducted by using different powder feeding nozzles—a three-jet and a coaxial powder feeding nozzle—since the powder stream is mainly determined by the geometry of the powder feeding nozzle. After the deposition trials, metallographic analysis of the samples has been performed. The laser intensity distribution (LID and the powder stream intensity distribution (PID have been characterized, based on which the processes have been simulated. Finally, for verifying and correcting the used models for the simulation, the simulated results have been compared with the experimental results. Through the conducted work, suitable boundary conditions for simulating the process with different powder streams has been determined, and the effects of the powder stream on the process have also been determined. For a LMD process with a three-jet nozzle a substantial part of the powder particles that hit the melt pool surface are rebounded; for a LMD process with a coaxial nozzle almost all the particles are caught in the melt pool. This is due to the different particle velocities achieved with the two different nozzles. Moreover, the powder stream affects the heat exchange between the heated particles and the melt pool: a surface boundary condition applies for a powder stream with lower particle velocities, in the experiment provided by a three-jet nozzle, and a volumetric boundary condition applies for a powder stream with higher particle velocities, provided by a coaxial nozzle.
Directory of Open Access Journals (Sweden)
Nobuto Oka
2015-10-01
Full Text Available A process based on reactive gas flow sputtering (GFS for depositing visible-light active photocatalytic WO3 films at high deposition rates and with high film quality was successfully demonstrated. The deposition rate for this process was over 10 times higher than that achieved by the conventional sputtering process and the process was highly stable. Furthermore, Pt nanoparticle-loaded WO3 films deposited by the GFS process exhibited much higher photocatalytic activity than those deposited by conventional sputtering, where the photocatalytic activity was evaluated by the extent of decomposition of CH3CHO under visible light irradiation. The decomposition time for 60 ppm of CH3CHO was 7.5 times more rapid on the films deposited by the GFS process than on the films deposited by the conventional process. During GFS deposition, there are no high-energy particles bombarding the growing film surface, whereas the bombardment of the surface with high-energy particles is a key feature of conventional sputtering. Hence, the WO3 films deposited by GFS should be of higher quality, with fewer structural defects, which would lead to a decrease in the number of centers for electron-hole recombination and to the efficient use of photogenerated holes for the decomposition of CH3CHO.
High-rate sputter deposition of NiAl on sapphire fibers
Energy Technology Data Exchange (ETDEWEB)
Reichert, K.; Martinez, C.; Cremer, R.; Neuschuetz, D. [Lehrstuhl fuer Theoretische Huettenkunde, RWTH Aachen, Aachen (Germany)
2002-07-01
Once the fiber-matrix bonding has been optimized to meet the different requirements during fabrication and operation of the later composite component, sapphire fiber reinforced NiAl will be a potential candidate to substitute conventional superalloys as structural material for gas turbine blades. To improve the composite fabrication process, a direct deposition of the intermetallic matrix material onto hBN coated sapphire fibers prior to the consolidation of the fiber-matrix composite is proposed. It is believed that this will simplify the fabrication process and prevent pore formation during the diffusion bonding. In addition, the fiber volume fraction can be quite easily adjusted by varying the NiAl coating thickness. For this, a high-rate deposition of NiAl is in any case necessary. It has been achieved by a pulsed DC magnetron sputtering of combined Al-Ni targets with the fibers rotating between the two facing cathodes. The obtained nickel aluminide coatings were analyzed as to structure and composition by means of X-ray (GIXRD) as well as electron diffraction (RHEED) and X-ray photoelectron spectroscopy (XPS), respectively. The morphology of the NiAl coatings was examined by SEM. (orig.)
Energy Technology Data Exchange (ETDEWEB)
Su, Yu-Wei, E-mail: suyuweiwayne@gmail.com [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Ramprasad, Sudhir [Energy Processes and Materials Division, Pacific Northwest National Laboratory, Corvallis, OR 9730 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Han, Seung-Yeol; Wang, Wei [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Ryu, Si-Ok [School of Display and Chemical Engineering, Yeungnam University, 214-1 Dae-dong, Gyeonsan, Gyeongbuk 712-749 (Korea, Republic of); Palo, Daniel R. [Barr Engineering Co., Hibbing, MN 55747 (United States); Paul, Brian K. [School of Mechanical, Industrial and Manufacturing Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Chang, Chih-hung [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States)
2013-04-01
Continuous microreactor-assisted solution deposition is demonstrated for the deposition of CdS thin films on fluorine-doped tin oxide (FTO) coated glass. The continuous flow system consists of a microscale T-junction micromixer with the co-axial water circulation heat exchanger to control the reacting chemical flux and optimize the heterogeneous surface reaction. Dense, high quality nanocrystallite CdS thin films were deposited at an average rate of 25.2 nm/min, which is significantly higher than the reported growth rate from typical batch chemical bath deposition process. Focused-ion-beam was used for transmission electron microscopy specimen preparation to characterize the interfacial microstructure of CdS and FTO layers. The band gap was determined at 2.44 eV by UV–vis absorption spectroscopy. X-ray photon spectroscopy shows the binding energies of Cd 3d{sub 3/2}, Cd 3d{sub 5/2}, S 2P{sub 3/2} and S 2P{sub 1/2} at 411.7 eV, 404.8 eV, 162.1 eV and 163.4 eV, respectively. - Highlights: ► CdS films deposited using continuous microreactor-assisted solution deposition (MASD) ► Dense nanocrystallite CdS films can be reached at a rate of 25.2 [nm/min]. ► MASD can approach higher film growth rate than conventional chemical bath deposition.
Illiberi, A.; Kniknie, B.; Steijvers, H.L.A.H.; Habets, D.; Simons, P.J.P.M.; Beckers, E.H.A.; Deelen, J. van
2012-01-01
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. ZnOx:Al films can be grown at very high deposition rates of ~ 14 nm/s for a substrate speed from 150 mm/min to 500
International Nuclear Information System (INIS)
Hyuk Son, In; Park, Kwangjin; Hwan Park, Jong
2017-01-01
Nickel-rich layered-oxide materials are considered promising candidates for application as cathode material in high-energy lithium ion batteries. However, their cycling performance at high voltages and rate conditions require further improvement for the purpose of commercialization. Here, we report on the facile surface modification of nickel-rich layered oxide by chemical vapor deposition with methane which yields a conductive and protective artificial solid electrolyte interphase layer consisting of amorphous carbon, alkyl lithium carbonate, and lithium carbonate. We examine the mechanism of the protective layer formation and structural deformation of the nickel-rich layered oxide during chemical vapor deposition with methane. Via optimizing the reaction conditions, we improve the electrical conductivity as well as the interfacial stability of the nickel-rich layered oxide without inducing structural deformation. The surface-modified nickel-rich layered oxide exhibits an improved performance due to the resulting enhanced rate capability, high initial efficiency, and long cycle life at high voltage (>4.5 V).
Directory of Open Access Journals (Sweden)
Hüpkes J.
2011-10-01
Full Text Available Sputtered and wet-chemically texture etched zinc oxide (ZnO films on glass substrates are regularly applied as transparent front contact in silicon based thin film solar cells. In this study, chemical wet etching in diluted hydrofluoric acid (HF and subsequently in diluted hydrochloric acid (HCl on aluminum doped zinc oxide (ZnO:Al films deposited by magnetron sputtering from ceramic tube targets at high discharge power (~10 kW/m target length is investigated. Films with thickness of around 800 nm were etched in diluted HCl acid and HF acid to achieve rough surface textures. It is found that the etching of the films in both etchants leads to different surface textures. A two steps etching process, which is especially favorable for films prepared at high deposition rate, was systematically studied. By etching first in diluted hydrofluoric acid (HF and subsequently in diluted hydrochloric acid (HCl these films are furnished with a surface texture which is characterized by craters with typical diameter of around 500 − 1000 nm. The resulting surface structure is comparable to etched films sputtered at low deposition rate, which had been demonstrated to be able to achieve high efficiencies in silicon thin film solar cells.
Influence of Gas Flow Rate on the Deposition Rate on Stainless Steel 202 Substrates
Directory of Open Access Journals (Sweden)
M.A. Chowdhury
2012-12-01
Full Text Available Solid thin films have been deposited on stainless steel 202 (SS 202 substrates at different flow rates of natural gas using a hot filament thermal chemical vapor deposition (CVD reactor. In the experiments, the variations of thin film deposition rate with the variation of gas flow rate have been investigated. The effects of gap between activation heater and substrate on the deposition rate have also been observed. Results show that deposition rate on SS 202 increases with the increase in gas flow rate within the observed range. It is also found that deposition rate increases with the decrease in gap between activation heater and substrate. In addition, friction coefficient and wear rate of SS 202 sliding against SS 304 under different sliding velocities are also investigated before and after deposition. The experimental results reveal that improved friction coefficient and wear rate is obtained after deposition than that of before deposition.
Interest Rate Fluctuation Effect on Commercial Bank's Fixed Fund Deposit in Nigeria
Okolo Chimaobi Valentine
2015-01-01
Commercial banks in Nigeria adopted many strategies to attract fresh deposits including the use of high deposit rate. However, pricing of banking services moved in favor of the banks at the expense of customers, resulting in their seeking other investment alternatives rather than saving their money in the bank. Both deposit and lending rates were greatly influenced by the Central Bank of Nigeria (CBN) decision on interest rate. Therefore, commercial bank effort to attract...
Influence of Gas Flow Rate on the Deposition Rate on Stainless Steel 202 Substrates
M.A. Chowdhury; D.M. Nuruzzaman
2012-01-01
Solid thin films have been deposited on stainless steel 202 (SS 202) substrates at different flow rates of natural gas using a hot filament thermal chemical vapor deposition (CVD) reactor. In the experiments, the variations of thin film deposition rate with the variation of gas flow rate have been investigated. The effects of gap between activation heater and substrate on the deposition rate have also been observed. Results show that deposition rate on SS 202 increases with the increase in g...
Energy Technology Data Exchange (ETDEWEB)
Amin-Ahmadi, B., E-mail: behnam.amin-ahmadi@ua.ac.be [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium); Idrissi, H. [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium); Galceran, M. [Université Libre de Bruxelles, Matters and Materials Department, 50 Av. FD Roosevelt CP194/03, 1050 Brussels (Belgium); Colla, M.S. [Institute of Mechanics, Materials and Civil Engineering, Université catholique de Louvain, Place Sainte Barbe 2, B-1348 Louvain-la-Neuve (Belgium); Raskin, J.P. [Information and Communications Technologies, Electronics and Applied Mathematics (ICTEAM), Microwave Laboratory, Université catholique de Louvain, B-1348 Louvain-la-Neuve (Belgium); Pardoen, T. [Institute of Mechanics, Materials and Civil Engineering, Université catholique de Louvain, Place Sainte Barbe 2, B-1348 Louvain-la-Neuve (Belgium); Godet, S. [Université Libre de Bruxelles, Matters and Materials Department, 50 Av. FD Roosevelt CP194/03, 1050 Brussels (Belgium); Schryvers, D. [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium)
2013-07-31
The influence of the deposition rate on the formation of growth twins in nanocrystalline Pd films deposited by electron beam evaporation is investigated using transmission electron microscopy. Statistical measurements prove that twin boundary (TB) density and volume fraction of grains containing twins increase with increasing deposition rate. A clear increase of the dislocation density was observed for the highest deposition rate of 5 Å/s, caused by the increase of the internal stress building up during deposition. Based on crystallographic orientation indexation using transmission electron microscopy, it can be concluded that a {111} crystallographic texture increases with increasing deposition rate even though the {101} crystallographic texture remains dominant. Most of the TBs are fully coherent without any residual dislocations. However, for the highest deposition rate (5 Å/s), the coherency of the TBs decreases significantly as a result of the interaction of lattice dislocations emitted during deposition with the growth TBs. The analysis of the grain boundary character of different Pd films shows that an increasing fraction of high angle grain boundaries with misorientation angles around 55–65° leads to a higher potential for twin formation. - Highlights: • Fraction of twinned grains and twin boundary density increase with deposition rate. • Clear increase of dislocation density was observed for the highest deposition rate. • A moderate increase of the mean grain size with increase of deposition rate is found. • For the highest deposition rate, the twin boundaries lose their coherency. • Fraction of high angle grain boundary (55–65) increases with deposition rate.
Deposition rates of viruses and bacteria above the atmospheric boundary layer.
Reche, Isabel; D'Orta, Gaetano; Mladenov, Natalie; Winget, Danielle M; Suttle, Curtis A
2018-04-01
Aerosolization of soil-dust and organic aggregates in sea spray facilitates the long-range transport of bacteria, and likely viruses across the free atmosphere. Although long-distance transport occurs, there are many uncertainties associated with their deposition rates. Here, we demonstrate that even in pristine environments, above the atmospheric boundary layer, the downward flux of viruses ranged from 0.26 × 10 9 to >7 × 10 9 m -2 per day. These deposition rates were 9-461 times greater than the rates for bacteria, which ranged from 0.3 × 10 7 to >8 × 10 7 m -2 per day. The highest relative deposition rates for viruses were associated with atmospheric transport from marine rather than terrestrial sources. Deposition rates of bacteria were significantly higher during rain events and Saharan dust intrusions, whereas, rainfall did not significantly influence virus deposition. Virus deposition rates were positively correlated with organic aerosols 0.7 μm, implying that viruses could have longer residence times in the atmosphere and, consequently, will be dispersed further. These results provide an explanation for enigmatic observations that viruses with very high genetic identity can be found in very distant and different environments.
Energy Technology Data Exchange (ETDEWEB)
Karpuz, Ali [Karamanoglu Mehmetbey Univ., Karaman (Turkey). Dept. of Physics; Colmekci, Salih; Kockar, Hakan; Kuru, Hilal; Uckun, Mehmet [Balikesir Univ. (Turkey). Dept. of Physics
2018-04-01
The structural and corresponding magnetic properties of Ni/Cu films sputtered at low and high deposition rates were investigated as there is a limited number of related studies in this field. 5[Ni(10 nm)/Cu(30 nm)] multilayer thin films were deposited using two DC sputtering sources at low (0.02 nm/s) and high (0.10 nm/s) deposition rates of Ni layers. A face centered cubic phase was detected for both films. The surface of the film sputtered at the low deposition rate has a lot of micro-grains distributed uniformly and with sizes from 0.1 to 0.4 μm. Also, it has a vertical acicular morphology. At high deposition rate, the number of micro-grains considerably decreased, and some of their sizes increased up to 1 μm. The surface of the Ni/Cu multilayer deposited at the low rate has a relatively more grainy and rugged structure, whereas the surface of the film deposited at the high rate has a relatively larger lateral size of surface grains with a relatively fine morphology. Saturation magnetisation, M{sub s}, values were 90 and 138 emu/cm{sup 3} for deposition rates of 0.02 and 0.10 nm/s, respectively. Remanence, M{sub r}, values were also found to be 48 and 71 emu/cm{sup 3} for the low and high deposition rates, respectively. The coercivity, H{sub c}, values were 46 and 65 Oe for the low and high Ni deposition rates, respectively. The changes in the film surfaces provoked the changes in the H{sub c} values. The M{sub s}, M{sub r}, and H{sub c} values of the 5[Ni(10 nm)/Cu(30 nm)] films can be adjusted considering the surface morphologies and film contents caused by the different Ni deposition rates.
International Nuclear Information System (INIS)
Nara, Yasuo; Sugita, Yoshihiro; Ito, Takashi; Kato, Hiroo; Tanaka, Ken-ichiro
1989-01-01
The authors have investigated the synchrotron radiation excited deposition of silicon films on the SiO 2 substrate by using SiH 4 /He mixture gas at BL-12C at Photon Factory. They used VUV light from the multilayer mirror with the center photon energy from 97 to 123eV, which effectively excites L-core electrons of silicon. Substrate temperature was widely varied from -178 degree C to 500 degree C. At -178 degree C, the deposition rate was as high as 400nm/200mAHr (normalized at the storage ring current at 200mA). As increasing the substrate temperature, the deposition rate was drastically decreased. The number of deposited silicon atoms is estimated to be 4 to 50% of incident photons, while the number of photo generated species in the gas phase within the mean free path from the surface is calculated as few as about 10 -3 of incident photons. These experimental results show that the deposition reaction is governed by the dissociation of surface adsorbates by the synchrotron radiation
Measurements of the deposition rates of radon daughters on indoor surfaces
International Nuclear Information System (INIS)
Wang, H.; Essling, M.A.; Toohey, R.E.; Rundo, J.
1982-01-01
The deposition rates of radon daughters on indoor surfaces have been measured by exposing the window of a proportional counter to the air of a house with high concentrations of radon and its daughters. Deposition velocities for unattached 218 Po (RaA) and 214 Pb (RaB) of approximately 4 mm sec - 1 were obtained by dividing the deposition rates by the concentrations of unattached daughters in the air. These results agree with those obtained by other workers but are dependent on the assumptions made about the fractions of the daughters which are attached to the atmospheric aerosol
CAMELS-based Determinants for the Credit Rating of Turkish Deposit Banks
Directory of Open Access Journals (Sweden)
Serhat Yuksel
2015-10-01
Full Text Available This paper demonstrates the relationship between CAMELS ratios and credit ratings of deposit banks in Turkey. Annual data was used for the period between 2004 and 2014 in this study. Moreover, 20 deposit banks of Turkey were analyzed and 21 different ratios of CAMELS components were used. In addition to that, credit ratings of these banks were provided from Moody’s corporation or annual activity reports of the banks. After that, we created multi nominal logistic regression analysis in order to illustrate the relationship. The major finding in this study is that three components (Asset Quality, Management Quality, and Sensitivity to Market Risk of CAMELS have effects on credit ratings whereas the ratios related to Capital Adequacy and Earnings are not effective. As a result, it was recommended that Turkish deposit banks should concentrate on the percentage of fixed assets and interest income to have a better rating. Moreover, having high market share with respect to total assets and lower interest expense are also other important points for this purpose. On the other hand, Turkish deposit banks should control the proportion of financial assets and increase the amount of FX liquid assets to prevent credit ratings to decrease. Additionally, market share of banks for loans should not reach at high level for this objective.
International Nuclear Information System (INIS)
Oka, Nobuto; Kawase, Yukari; Shigesato, Yuzo
2012-01-01
Sn-doped In 2 O 3 (ITO) films were deposited on heated (200 °C) fused silica glass substrates by reactive DC sputtering with mid-frequency pulsing (50 kHz) and a plasma control unit combined with a feedback system of the optical emission intensity for the atomic O* line at 777 nm. A planar In–Sn alloy target was connected to the switching unit, which was operated in the unipolar pulse mode. The power density on the target was maintained at 4.4 W cm −2 during deposition. The feedback system precisely controlled the oxidation of the target surface in “the transition region.” The ITO film with lowest resistivity (3.1 × 10 −4 Ω cm) was obtained with a deposition rate of 310 nm min −1 and transmittance in the visible region of approximately 80%. The deposition rate was about 6 times higher than that of ITO films deposited by conventional sputtering using an oxide target.
FURTHER STUDIES ON THE VARIATION OF SPRAY DEPOSITS IN VINEYARDS WITH AIRFLOW RATE AND VOLUME RATE
Directory of Open Access Journals (Sweden)
Emanuele Cerruto
2007-03-01
Full Text Available The present research, continuing that reported in [2], deals with the spray application subject, so to investigate as volume rate and airflow rate, forward speed being equal, affect the foliar deposition in an espalier vineyard. Experimental trials were carried out by means of an air assisted towed sprayer, equipped with “Albuz ATR” nozzles. To take into account the influence of the development of the trees, the field trials were replicated in two phenological stages with an interval of about one month: “Inflorescences fully developed” (stage 1 and “Beginning of berry touch” (stage 2. A full factorial experiment was carried out for each growth stage, with two airflow rates (3.9 and 7.5 m3/s, three volume rates (103, 216, and 276 L/ha in the first growth stage and 154, 330 and 432 L/ha in the second growth stage, and four replicates, arranged according to a randomised complete block design. Working pressure (1.2 MPa and forward speed (1.4 m/s were kept unchanged for all the trials. The foliar deposition was measured by means of a spectrophotometric technique. The leaves were sampled on two depth layers and two or three heights, according to the trees’ development. The results showed that volume rate did not significantly influence the mean foliar deposition in both the two growth stages, while the highest deposits were obtained with the lowest airflow rate. The airflow rate × volume rate interaction, though not statistically significant, showed that low volume rates together with high airflow rates, result in a noticeable reduction in foliar deposition (29% with respect the grand mean, due to an increase of the spry drift, especially at the first growth stage, when the foliar development is little. These second tests, unlike those described in [2], did not show any positive influence of the airflow rate on the foliar deposition in the inner part of the canopy, so further investigations could be necessary to better understand the
Deposition of magnetite particles from high velocity water onto isothermal tubes
International Nuclear Information System (INIS)
Burrill, K.A.
1977-02-01
The deposition rate of magnetite particles from a high velocity water slurry onto isothermal metal tubes was measured. The effects of velocity (5 to 100 m/s), slurry concentration (200 to 1000 mg Fe/kg H 2 O), temperature (25 0 to 90 0 C), pH (4 to 10 at 25 0 C), and tube material (nickel, Zircaloy-4) on deposition rate were studied. The data are interpreted in terms of two steps in series for deposition: a mass transfer step followed by a deposition or inertial coasting step. Mass transfer of particles through the bulk water phase apparently limits the deposition of particles at high Reynolds number
Sedimentation rates and depositional processes in Lake Superior from 210Pb geochronology
International Nuclear Information System (INIS)
Evans, J.E.; Johnson, T.C.; Alexander, E.C. Jr.; Lively, R.S.; Eisenreich, S.J.
1981-01-01
Sedimentation rates range from 0.01 to 0.32 cm/yr in 17 sediment box cores from Lake Superior, as determined by 210 Pb geochronology. Shoreline erosion and resuspension of nearshore sediments causes moderate to high (0.05-0.11 cm/yr) sedimentation rates in the western arm of Lake Superior. Sedimentation rates are very high (> 0.15 cm/yr) in marginal bays adjoining Lake Superior; and moderate to very high (0.07-0.19 cm/yr) in open lake regions adjacent to marginal bays. Resuspension of nearshore and shoal top sediments in southern and southeastern Lake Superior by storms is responsible for depositional anomalies in 210 Pb profiles corresponding to 1905, 1916-1918, and 1940 storms. Sedimentation rates are very low (0.01-0.03 cm/yr) in the central basins due to isolation from sediment sources. These data indicate that sedimentation rates and processes vary significantly in different regions of Lake Superior. The sedimentation rates provided by this study, in conjunction with previously-reported sedimentation rates, yield a better understanding of the Lake Superior depositional environment
International Nuclear Information System (INIS)
Tang Longjuan; Zhu Yinfang; Yang Jinling; Li Yan; Zhou Wei; Xie Jing; Liu Yunfei; Yang Fuhua
2009-01-01
The influence of deposition, annealing conditions, and etchants on the wet etch rate of plasma enhanced chemical vapor deposition (PECVD) silicon nitride thin film is studied. The deposition source gas flow rate and annealing temperature were varied to decrease the etch rate of SiN x :H by HF solution. A low etch rate was achieved by increasing the SiH 4 gas flow rate or annealing temperature, or decreasing the NH 3 and N2 gas flow rate. Concentrated, buffered, and dilute hydrofluoric acid were utilized as etchants for SiO 2 and SiN x :H. A high etching selectivity of SiO 2 over SiN x :H was obtained using highly concentrated buffered HF.
Accumulation rates and sediment deposition in the northwestern Mediterranean
Zuo, Z.; Eisma, D.; Gieles, R.; Beks, J.
As part of the EROS 2000 programme, sediment mixing and accumulation rates in the northwestern Mediterranean Sea were determined, applying the 210Pb dating method to a total of 49 cores, and the results from 29 sediment cores are presented here. On the basis of the results from the 49 sediment cores, an attempt was made to present a general picture of sediment accumulation for the area of the northwestern Mediterranean. The total deposition of sediment in the area is estimated to be of the order of 34±15 × 106 ton year-1, which is half the value reported earlier by Got and Aloisi (1990) (Continental Shelf Research, 10, 841-855) for the same region. The activity-depth profiles of 210Pb show the presence of intensive mixing in the upper layer of near-shore sediments, but little or no mixing is observed in the deep-water sediments. Based on a diffusion model, sediment mixing rates calculated from excess 210Pb gradients vary from 0·002 to 7· cm2 year-1, and the deposition rates from 0·01 to 0·60 cm year-1. A linear dependence of sedimentation rate on water depth derived from the sediment cores indicates an inverse correlation between these two. The relatively high sedimentation rates and mixing rates found near the Rhône River suggest that the contribution from the river dominates the deposition system in the northwestern Mediterranean. In the deep-water basin, however, atmospheric input and biological production are clearly more important.
Chronostratigraphy and deposition rates in the Okinawa Trough region
Institute of Scientific and Technical Information of China (English)
李培英; 王永吉; 刘振夏
1999-01-01
Six representative cores from Okinawa Trough have been dated using AMS 14C, Standard 14C and ESR methods, and comparatively analysed. Systematic measurements of the oriented samples taken from the cores were conducted for obtaining their remnant magnetic polarity. With the aid of the dates obtained, particularly the AMS 14C ages of planktonic foraminiferal tests, two polarity events and two polar wanderings of the earth magnetic field have been defined. Calculations of the deposition rates for all the six core sites indicate rather high values in the trough plain, at least equivalent to those rates reported for the region of the East China Sea. They commonly range from 10 to 30 cm/ka, and even greater than 40 cm/ka in some localities. The deposition rate varied widely with topography and periods of time. In general, it is greater during the postglacial period than during the last glaciation. The chronostratigraphy in the Okinawa Trough region established through this study argues against the pr
Czech Academy of Sciences Publication Activity Database
Bleykher, G.A.; Borduleva, A.O.; Yuryeva, A.V.; Krivobokov, V.P.; Lančok, Ján; Bulíř, Jiří; Drahokoupil, Jan; Klimša, Ladislav; Kopeček, Jaromír; Fekete, Ladislav; Čtvrtlík, Radim; Tomáštík, Jan
2017-01-01
Roč. 324, Sep (2017), s. 111-120 ISSN 0257-8972 R&D Projects: GA MŠk LO1409; GA MŠk LM2015088 Institutional support: RVO:68378271 Keywords : magnetron sputtering * evaporation * high-rate coating deposition * coating properties * Cu coatings Subject RIV: BM - Solid Matter Physics ; Magnetism OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.) Impact factor: 2.589, year: 2016
Directory of Open Access Journals (Sweden)
Garth W. Redfield
2002-01-01
Full Text Available This paper summarizes concepts underlying the atmospheric input of phosphorus (P to ecosystems, published rates of P deposition, measurement methods, and approaches to future monitoring and research. P conveyed through the atmosphere can be a significant nutrient source for some freshwater and marine ecosystems. Particle sources and sinks at the land-air interface produce variation in P deposition from the atmosphere across temporal and spatial scales. Natural plant canopies can affect deposition rates by changing the physical environment and surface area for particle deposition. Land-use patterns can alter P deposition rates by changing particle concentrations in the atmosphere. The vast majority of P in dry atmospheric deposition is conveyed by coarse (2.5 to 10 μm and giant (10 to 100 μm particles, and yet these size fractions represent a challenge for long-term atmospheric monitoring in the absence of accepted methods for routine sampling. Most information on P deposition is from bulk precipitation collectors and wet/dry bucket sampling, both with questionable precision and accuracy. Most published annual rates of P deposition are gross estimates derived from bulk precipitation sampling in locations around the globe and range from about 5 to well over 100 mg P m–2 year–1, although most inland ecosystems receive between 20 and 80 mg P m–2 year–1. Rates below 30 mg P m–2 year–1 are found in remote areas and near coastlines. Intermediate rates of 30 to 50 mg P m–2 year–1 are associated with forests or mixed land use, and rates of 50 to 100 mg P m–2 year–1 or more are often recorded from urban or agricultural settings. Comparison with other methods suggests that these bulk precipitation estimates provide crude boundaries around actual P deposition rates for various land uses. However, data screening cannot remove all positive bias caused by contamination of bucket or bulk collectors. As a consequence, continued sampling
Susi, Louis; Reader, Al; Nusstein, John; Beck, Mike; Weaver, Joel; Drum, Melissa
2008-01-01
The authors, using a crossover design, randomly administered, in a single-blind manner, 3 primary intraosseous injections to 61 subjects using: the Wand local anesthetic system at a deposition rate of 45 seconds (fast injection); the Wand local anesthetic system at a deposition rate of 4 minutes and 45 seconds (slow injection); a conventional syringe injection at a deposition rate of 4 minutes and 45 seconds (slow injection), in 3 separate appointments spaced at least 3 weeks apart. A pulse oximeter measured heart rate (pulse). The results demonstrated the mean maximum heart rate was statistically higher with the fast intraosseous injection (average 21 to 28 beats/min increase) than either of the 2 slow intraosseous injections (average 10 to 12 beats/min increase). There was no statistically significant difference between the 2 slow injections. We concluded that an intraosseous injection of 1.4 mL of 2% lidocaine with 1 : 100,000 epinephrine with the Wand at a 45-second rate of anesthetic deposition resulted in a significantly higher heart rate when compared with a 4-minute and 45-second anesthetic solution deposition using either the Wand or traditional syringe.
The deposition of magnetite particles from high velocity water onto isothermal tubes
International Nuclear Information System (INIS)
Burrill, K.A.
1977-02-01
The deposition rate of magnetite particles from a high velocity water slurry onto isothermal metal tubes was measured. The effects of velocity (5 to 100 m/s), slurry concentration (200 to 1000 mg Fe/kg H 2 O), temperature (25 to 90 deg C), pH (4 to 10 at 25 deg C), and tube material (nickel, Zircaloy-4) on deposition rate were studied. The data are interpreteω in terms of two steps in series for deposition: a mass transfer step followed by a deposition or ''inertial coasting'' step. Mass transfer of particles through the bulk water phase apparently limits the deposition of particles at high Reynolds number (10 5 ). (author)
International Nuclear Information System (INIS)
Abd–Alghafour, N. M.; Ahmed, Naser M.; Hassan, Zai; Mohammad, Sabah M.
2016-01-01
Vanadium oxide (V_2O_5) thin films were deposited on glass substrates by using a cost-efficient spray pyrolysis technique. The films were grown at 350° through thermal decomposition of VCl_3 in deionized water with different solution spray rates. The high resolution X-ray diffraction results revealed the formation of nanocrystalline films having orthorhombic structures with preferential orientation along (101) direction. The spray rate influenced the surface morphology and crystallite size of the films. The crystallite size was found to increase whereas the micro-strain was decreased by increasing the spray deposition rates. The increase in crystallite size and decrease in the macrostrain resulted in an improvement in the films’ crystallinity. The UV-Visible spectroscopy analysis indicated that the average transmittance of all films lies in the range 75-80 %. The band gap of V_2O_5 film was decreased from 2.65 to 2.46 eV with increase of the spray deposition rate from 5 ml/min to 10 ml/min. first, second, and third level headings (first level heading).
International Nuclear Information System (INIS)
Kilper, T.; Donker, M.N. van den; Carius, R.; Rech, B.; Braeuer, G.; Repmann, T.
2008-01-01
Silicon thin-film solar cells based on microcrystalline silicon (μc-Si:H) were prepared in a 30 x 30 cm 2 plasma-enhanced chemical vapor deposition reactor using 13.56 or 40.68 MHz plasma excitation frequency. Plasma emission was recorded by optical emission spectroscopy during μc-Si:H absorber layer deposition at deposition rates between 0.5 and 2.5 nm/s. The time course of SiH * and H β emission indicated strong drifts in the process conditions particularly at low total gas flows. By actively controlling the SiH 4 gas flow, the observed process drifts were successfully suppressed resulting in a more homogeneous i-layer crystallinity along the growth direction. In a deposition regime with efficient usage of the process gas, the μc-Si:H solar cell efficiency was enhanced from 7.9 % up to 8.8 % by applying process control
Study on the Deposition Rate Depending on Substrate Position by Using Ion Beam Sputtering Deposition
Energy Technology Data Exchange (ETDEWEB)
Kim, Yonggi; Kim, Bomsok; Lee, Jaesang [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)
2014-05-15
Ion beams have been used for over thirty years to modify materials in manufacturing of integrated circuits, and improving the corrosion properties of surfaces. Recently, the requirements for ion beam processes are becoming especially challenging in the following areas : ultra shallow junction formation for LSI fabrication, low damage high rate ion beam sputtering and smoothing, high quality functional surface treatment for electrical and optical properties. Ion beam sputtering is an attractive technology for the deposition of thin film coatings onto a broad variety of polymer, Si-wafer, lightweight substrates. Demand for the decoration metal is increasing. In addition, lightweight of parts is important, because of energy issues in the industries. Although a lot of researches have been done with conventional PVD methods for the deposition of metal or ceramic films on the surface of the polymer, there are still adhesion problems.
Measurements of dry-deposition rates on various earth surfaces by 212Pb
International Nuclear Information System (INIS)
Osaki, S.; Sugihara, S.; Maeda, Y.
2004-01-01
Dry deposition rates of 212 Pb on a coniferous forest (Japanese cedar) and a broad-leaf forest (Pasania edulis) have been measured. Those on various kinds of grass fields, various states on artificial surface such as water, paper, and standing paper have been also measured. The dry deposition rates depend on the characteristics of depositing particles and the conditions of deposited surfaces. Dry deposition rates on the forest of Japanese cedar are highest because of the complex and adhesive surface of the leaves. Those on various grass fields are roughly depend on the logarithm of the height of their grasses. The total deposition rates of 7 Be do not depend on the densities or heights of the grasses. 7 Be may be not kept on their leaves or surface soil for a long time. The dry deposition rates of on artificial surface, e.g. paper and water surfaces make clear the mechanism on dry deposition, and suggest that more chances of collision and more adhesive of the surface are important for the dry deposition. About 90% of all deposition on the artificial paper grass was attached on the standing paper. On water surface, 60% of the rate of paper grass was attached, but only about 20% were attached on a dry paper plate. The aerosol particles are deposited by collision with the surface, therefore the deposition velocity depends on the chance of collision and the characteristics of the surface. Therefore the dry deposition rates on forests are larger and those of coniferous forest are largest. (author)
Energy Technology Data Exchange (ETDEWEB)
Schaffner, J., E-mail: jschaffner@surface.tu-darmstadt.de; Feldmeier, E.; Swirschuk, A.; Schimper, H.-J.; Klein, A.; Jaegermann, W.
2011-08-31
The growth of CdS thin films by close space sublimation (CSS) has been systematically studied using an ultra-high vacuum system known as DAISY-SOL in order to understand the basic growth mechanisms and their impact on the film properties. Substrate temperature and deposition rate were varied, and the surface properties of the CdS layer were determined by photoelectron spectroscopy (XPS) without breaking the vacuum. To analyze the influence of the deposition conditions on the layer morphology and crystallographic structure, the films were further characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The SEM and AFM studies show a correlation between the deposition rate and the film morphology. For high deposition rates, edged grain shapes and smoother surfaces were observed than for low deposition rates. CdS films were deposited onto two different commercially available fluorine-doped tin oxide (FTO) substrates. XRD studies show that a high <200> texture of the FTO substrate prefers the CdS growth in <0001> orientation of the hexagonal crystal modification.
Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films
Dimitrakellis, P.; Kalampounias, A. G.; Spiliopoulos, N.; Amanatides, E.; Mataras, D.; Lahootun, V.; Coeuret, F.; Madec, A.
2016-07-01
The effect of small disilane addition on the gas phase properties of silane-hydrogen plasmas and the microcrystalline silicon thin films growth is presented. The investigation was conducted in the high pressure regime and for constant power dissipation in the discharge with the support of plasma diagnostics, thin film studies and calculations of discharge microscopic parameters and gas dissociation rates. The experimental data and the calculations show a strong effect of disilane on the electrical properties of the discharge in the pressure window from 2 to 3 Torr that is followed by significant raise of the electron number density and the drop of the sheaths electric field intensity. Deposition rate measurements show an important four to six times increase even for disilane mole fractions as low as 0.3 %. The deposition rate enhancement was followed by a drop of the material crystalline volume fraction but films with crystallinity above 40 % were deposited with different combinations of total gas pressure, disilane and silane molar ratios. The enhancement was partly explained by the increase of the electron impact dissociation rate of silane which rises by 40% even for 0.1% disilane mole fraction. The calculations of the gas usage, the dissociation and the deposition efficiencies show that the beneficial effect on the growth rate is not just the result of the increase of Si-containing molecules density but significant changes on the species participating to the deposition and the mechanism of the film growth are caused by the disilane addition. The enhanced participation of the highly sticking to the surface radical such as disilylene, which is the main product of disilane dissociation, was considered as the most probable reason for the significant raise of the deposition efficiency. The catalytic effect of such type of radical on the surface reactivity of species with lower sticking probability is further discussed, while it is also used to explain the restricted
Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films
International Nuclear Information System (INIS)
Dimitrakellis, P.; Amanatides, E.; Mataras, D.; Kalampounias, A. G.; Spiliopoulos, N.; Lahootun, V.; Coeuret, F.; Madec, A.
2016-01-01
The effect of small disilane addition on the gas phase properties of silane-hydrogen plasmas and the microcrystalline silicon thin films growth is presented. The investigation was conducted in the high pressure regime and for constant power dissipation in the discharge with the support of plasma diagnostics, thin film studies and calculations of discharge microscopic parameters and gas dissociation rates. The experimental data and the calculations show a strong effect of disilane on the electrical properties of the discharge in the pressure window from 2 to 3 Torr that is followed by significant raise of the electron number density and the drop of the sheaths electric field intensity. Deposition rate measurements show an important four to six times increase even for disilane mole fractions as low as 0.3 %. The deposition rate enhancement was followed by a drop of the material crystalline volume fraction but films with crystallinity above 40 % were deposited with different combinations of total gas pressure, disilane and silane molar ratios. The enhancement was partly explained by the increase of the electron impact dissociation rate of silane which rises by 40% even for 0.1% disilane mole fraction. The calculations of the gas usage, the dissociation and the deposition efficiencies show that the beneficial effect on the growth rate is not just the result of the increase of Si-containing molecules density but significant changes on the species participating to the deposition and the mechanism of the film growth are caused by the disilane addition. The enhanced participation of the highly sticking to the surface radical such as disilylene, which is the main product of disilane dissociation, was considered as the most probable reason for the significant raise of the deposition efficiency. The catalytic effect of such type of radical on the surface reactivity of species with lower sticking probability is further discussed, while it is also used to explain the restricted
Energy Technology Data Exchange (ETDEWEB)
Liu, Yong [Iowa State Univ., Ames, IA (United States)
2002-01-01
Hydrogenated amorphous silicon germanium films (a-SiGe:H) and devices have been extensively studied because of the tunable band gap for matching the solar spectrum and mature the fabrication techniques. a-SiGe:H thin film solar cells have great potential for commercial manufacture because of very low cost and adaptability to large-scale manufacturing. Although it has been demonstrated that a-SiGe:H thin films and devices with good quality can be produced successfully, some issues regarding growth chemistry have remained yet unexplored, such as the hydrogen and inert-gas dilution, bombardment effect, and chemical annealing, to name a few. The alloying of the SiGe introduces above an order-of-magnitude higher defect density, which degrades the performance of the a-SiGe:H thin film solar cells. This degradation becomes worse when high growth-rate deposition is required. Preferential attachment of hydrogen to silicon, clustering of Ge and Si, and columnar structure and buried dihydride radicals make the film intolerably bad. The work presented here uses the Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapor Deposition (ECR-PECVD) technique to fabricate a-SiGe:H films and devices with high growth rates. Helium gas, together with a small amount of H2, was used as the plasma species. Thickness, optical band gap, conductivity, Urbach energy, mobility-lifetime product, I-V curve, and quantum efficiency were characterized during the process of pursuing good materials. The microstructure of the a-(Si,Ge):H material was probed by Fourier-Transform Infrared spectroscopy. They found that the advantages of using helium as the main plasma species are: (1) high growth rate--the energetic helium ions break the reactive gas more efficiently than hydrogen ions; (2) homogeneous growth--heavy helium ions impinging on the surface promote the surface mobility of the reactive radicals, so that heteroepitaxy growth as clustering of Ge and Si, columnar structure are
International Nuclear Information System (INIS)
Rodliffe, R.S.
1979-11-01
At the present time, there appear to be only four adequately controlled and characterised experimental studies of particle deposition from single phase water in turbulent pipe flow. These are used to illustrate the ranges of applicability of methods for predicting particle arrival rates at tube walls. Arrival rates are predicted from mass transfer correlations and the theory of Reeks and Skyrme (1976) when transport is limited by Brownian diffusion and inertial behaviour, respectively. The regimes in which finite particle size limits the application of these methods are defined and preliminary consideration is given to the conditions under which gravitational settling may make a contribution to deposition in vertically mounted tubes. (author)
International Nuclear Information System (INIS)
Takahashi, Yoshiyuki; Toyota, Hiromichi; Nomura, Shinfuku; Mukasa, Shinobu; Inoue, Toru
2009-01-01
In order to make high-speed deposition of diamond effective, diamond growth rates for gas-phase microwave plasma chemical vapor deposition and in-liquid microwave plasma chemical vapor deposition are compared. A mixed gas of methane and hydrogen is used as the source gas for the gas-phase deposition, and a methanol solution of ethanol is used as the source liquid for the in-liquid deposition. The experimental system pressure is in the range of 60-150 kPa. While the growth rate of diamond increases as the pressure increases, the amount of input microwave energy per unit volume of diamond is 1 kW h/mm 3 regardless of the method used. Since the in-liquid deposition method provides a superior cooling effect through the evaporation of the liquid itself, a higher electric input power can be applied to the electrodes under higher pressure environments. The growth rate of in-liquid microwave plasma chemical vapor deposition process is found to be greater than conventional gas-phase microwave plasma chemical vapor deposition process under the same pressure conditions.
Takahashi, Yoshiyuki; Toyota, Hiromichi; Nomura, Shinfuku; Mukasa, Shinobu; Inoue, Toru
2009-06-01
In order to make high-speed deposition of diamond effective, diamond growth rates for gas-phase microwave plasma chemical vapor deposition and in-liquid microwave plasma chemical vapor deposition are compared. A mixed gas of methane and hydrogen is used as the source gas for the gas-phase deposition, and a methanol solution of ethanol is used as the source liquid for the in-liquid deposition. The experimental system pressure is in the range of 60-150 kPa. While the growth rate of diamond increases as the pressure increases, the amount of input microwave energy per unit volume of diamond is 1 kW h/mm3 regardless of the method used. Since the in-liquid deposition method provides a superior cooling effect through the evaporation of the liquid itself, a higher electric input power can be applied to the electrodes under higher pressure environments. The growth rate of in-liquid microwave plasma chemical vapor deposition process is found to be greater than conventional gas-phase microwave plasma chemical vapor deposition process under the same pressure conditions.
High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma
International Nuclear Information System (INIS)
Jia, Haijun; Saha, Jhantu K.; Ohse, Naoyuki; Shirai, Hajime
2007-01-01
A high electron density (> 10 11 cm -3 ) and low electron temperature (1-2 eV) plasma is produced by using a microwave plasma source utilizing a spoke antenna, and is applied for the high-rate synthesis of high quality microcrystalline silicon (μc-Si) films. A very fast deposition rate of ∼ 65 A/s is achieved at a substrate temperature of 150 deg. C with a high Raman crystallinity and a low defect density of (1-2) x 10 16 cm -3 . Optical emission spectroscopy measurements reveal that emission intensity of SiH and intensity ratio of H α /SiH are good monitors for film deposition rate and film crystallinity, respectively. A high flux of film deposition precursor and atomic hydrogen under a moderate substrate temperature condition is effective for the fast deposition of highly crystallized μc-Si films without creating additional defects as well as for the improvement of film homogeneity
Illiberi, A.; Grob, F.; Frijters, C.; Poodt, P.; Ramachandra, R.; Winands, H.; Simor, M.; Bolt, P.J.
2013-01-01
Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma-enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ∼7 nm/s are achieved at low temperature (200°C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in
Energy Technology Data Exchange (ETDEWEB)
Abd–Alghafour, N. M., E-mail: na2013bil@gmail.com [Iraqi Ministry of Education, Anbar (Iraq); Ahmed, Naser M.; Hassan, Zai; Mohammad, Sabah M. [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, University Sains Malaysia,11800 Penang (Malaysia)
2016-07-19
Vanadium oxide (V{sub 2}O{sub 5}) thin films were deposited on glass substrates by using a cost-efficient spray pyrolysis technique. The films were grown at 350° through thermal decomposition of VCl{sub 3} in deionized water with different solution spray rates. The high resolution X-ray diffraction results revealed the formation of nanocrystalline films having orthorhombic structures with preferential orientation along (101) direction. The spray rate influenced the surface morphology and crystallite size of the films. The crystallite size was found to increase whereas the micro-strain was decreased by increasing the spray deposition rates. The increase in crystallite size and decrease in the macrostrain resulted in an improvement in the films’ crystallinity. The UV-Visible spectroscopy analysis indicated that the average transmittance of all films lies in the range 75-80 %. The band gap of V{sub 2}O{sub 5} film was decreased from 2.65 to 2.46 eV with increase of the spray deposition rate from 5 ml/min to 10 ml/min. first, second, and third level headings (first level heading).
Drosos, Charalampos; Jia, Chenglin; Mathew, Shiny; Palgrave, Robert G.; Moss, Benjamin; Kafizas, Andreas; Vernardou, Dimitra
2018-04-01
The growth of orthorhombic vanadium pentoxide nanostructures was accomplished using an aerosol-assisted chemical vapor deposition process. These materials showed excellent electrochemical performance for magnesium-ion storage in an aqueous electrolyte; showing specific discharge capacities of up to 427 mAh g-1 with a capacity retention of 82% after 2000 scans under a high specific current of 5.9 A g-1. The high rate capability suggested good structural stability and high reversibility. We believe the development of low-cost and large-area coating methods, such as the technique used herein, will be essential for the upscalable fabrication of next-generation rechargeable battery technologies.
International Nuclear Information System (INIS)
Pochet, T.; Ilie, A.; Foulon, F.
1993-01-01
This paper is concerned with the characterization of new detectors fabricated from a-Si:H films deposited at high rates through the dilution of SiH 4 in helium. Rates of up to ten times (5.5 micrometer/h) that of the standard technique are obtained, allowing for the feasible fabrication of detectors having thickness up to 100 micrometers. The electrical characteristics (depletion voltage, residual space charge density) of the helium diluted material, have been investigated and compared to that of the standard material. The response of detectors, made from both materials, to 5.5 MeV alpha particles are compared. 6 figs., 5 tabs., 13 refs
High production rate of IBAD-MgO buffered substrate
Energy Technology Data Exchange (ETDEWEB)
Yoshizumi, M., E-mail: myoshizumi@istec.or.j [Superconductivity Research Laboratory, ISTEC, Shinonome 1-10-13, Koto-ku, Tokyo 135-0062 (Japan); Miyata, S.; Ibi, A.; Fukushima, H.; Yamada, Y.; Izumi, T.; Shiohara, Y. [Superconductivity Research Laboratory, ISTEC, Shinonome 1-10-13, Koto-ku, Tokyo 135-0062 (Japan)
2009-10-15
The conventional IBAD (Ion Beam Assisted Deposition) process using fluorite materials yields low production rates, resulting in high production cost, which reduces the motivation for practical application in spite of its high quality. The IBAD process using rock salt materials, e.g. MgO, is well known as a strong candidate of practical application due to its potential of high production rate and high in-plane grain alignment. In this work, the IBAD-MgO process was investigated for a newly developed architecture of PLD (Pulsed Laser Deposition)-CeO{sub 2}/sputter-LMO (LaMnO{sub 3})/IBAD-MgO/sputter-GZO (Gd{sub 2}Zr{sub 2}O{sub 7})/Hastelloy{sup TM} to make long buffered metal tapes with high properties and a high production rate. The 50 m-long IBAD-MgO substrates with about 4 deg. of DELTAphiCeO{sub 2} in an XRD phi scan could be fabricated repeatedly. A GdBCO (GdBa{sub 2}Cu{sub 3}O{sub x}) layer deposited on the buffered substrate showed the minimum I{sub c} value of 325 A/cm-w in a 41 m-long tape. Almost of the tape showed 500-600 A/cm-w of I{sub c} value. The deposition time for the IBAD-MgO layer was 60 s which was about 2 orders of magnitude shorter than the conventional IBAD process. The production rate of 24 m/h was realized at the IBAD-MgO process to fabricate the GdBCO coated conductor with high J{sub c} and I{sub c} properties.
Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition
International Nuclear Information System (INIS)
Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik
2014-01-01
A key factor in engineering integrated devices such as electro-optic switches or waveguides is the patterning of high quality crystalline thin films into specific geometries. In this contribution high vacuum chemical vapor deposition (HV-CVD) was employed to grow titanium dioxide (TiO 2 ) patterns onto silicon. The directed nature of precursor transport – which originates from the high vacuum environment during the process – allows shading certain regions on the substrate by shadow masks and thus depositing patterned thin films. While the use of such masks is an emerging field in stencil or shadow mask lithography, their use for structuring thin films within HV-CVD has not been reported so far. The advantage of the employed technique is the precise control of lateral spacing and of the distance between shading mask and substrate surface which is achieved by manufacturing them directly on the substrate. As precursor transport takes place in the molecular flow regime, the precursor impinging rates (and therefore the film growth rates) on the surface can be simulated as function of the reactor and shading mask geometry using a comparatively simple mathematical model. In the current contribution such a mathematical model, which predicts impinging rates on plain or shadow mask structured substrates, is presented. Its validity is confirmed by TiO 2 -deposition on plain silicon substrates (450 °C) using titanium tetra isopropoxide as precursor. Limitations of the patterning process are investigated by the deposition of TiO 2 on structured substrates and subsequent shadow mask lift-off. The geometry of the deposits is according to the mathematical model. Shading effects due to the growing film enables to fabricate deposits with predetermined variations in topography and non-flat top deposits which are complicated to obtain by classical clean room processes. As a result of the enhanced residual pressure of decomposition products and titanium precursors and the
Optimal bank portfolio choice under fixed-rate deposit insurance
Anlong Li
1991-01-01
An analysis of the investment decisions of a bank whose deposits are fully insured under fixed-rate insurance, showing how banks dynamically adjust their investment portfolios in response to market information and how this flexibility affects both investment decisions and the fair cost of deposit insurance.
Energy Technology Data Exchange (ETDEWEB)
Einollahzadeh-Samadi, M.; Dariani, R.S., E-mail: dariani@alzahra.ac.ir
2013-09-01
Titanium films are deposited on transparent fluorine-doped tin oxide (FTO) glass substrates by DC magnetron sputtering process. Influences imposed by sputtering rate and substrate temperature on surface morphology and optical properties of the deposited Ti films are investigated. We observed that all the sputtered films exhibit uniform and compact surface morphology without peeling and cracking. Morphology of the films is studied using atomic force microscopy (AFM) and X-ray diffraction (XRD). The optical properties of the films are investigated using UV–vis spectroscopy. The morphological studies indicate that by increasing the substrate temperature from room temperature to 250 °C and/or decreasing sputtering rate from 660 Å/min to 540 Å/min the surface roughness decreased from 73.4 to 31.0 nm and the grain size increases from 50.76 nm to 163.93 nm. An important effect of the root mean square (RMS) surface roughness and grain size is modification of the films optical properties. In fact, an enhancement of refractive index n for the Ti films deposited at high substrate temperature and/or high deposition rate is observed, that is attributed to reduction of RMS roughness. This effect is attributed to increment of fractional volume which leads to an increase in density of deposited film. Thus, by controlling the sputtering conditions one can reach to the desired morphological and optical properties.
Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors
International Nuclear Information System (INIS)
Yao Jianke; Xu Cheng; Ma Jianyong; Fang Ming; Fan Zhengxiu; Jin Yunxia; Zhao Yuanan; He Hongbo; Shao Jianda
2009-01-01
TiO 2 single layers and TiO 2 /SiO 2 high reflectors (HR) are prepared by electron beam evaporation at different TiO 2 deposition rates. It is found that the changes of properties of TiO 2 films with the increase of rate, such as the increase of refractive index and extinction coefficient and the decrease of physical thickness, lead to the spectrum shift and reflectivity bandwidth broadening of HR together with the increase of absorption and decrease of laser-induced damage threshold. The damages are found of different morphologies: a shallow pit to a seriously delaminated and deep crater, and the different amorphous-to-anatase-to-rutile phase transition processes detected by Raman study. The frequency shift of Raman vibration mode correlates with the strain in film. Energy dispersive X-ray analysis reveals that impurities and non-stoichiometric defects are two absorption initiations resulting to the laser-induced transformation.
High Mercury Wet Deposition at a "Clean Air" Site in Puerto Rico.
Shanley, James B; Engle, Mark A; Scholl, Martha; Krabbenhoft, David P; Brunette, Robert; Olson, Mark L; Conroy, Mary E
2015-10-20
Atmospheric mercury deposition measurements are rare in tropical latitudes. Here we report on seven years (April 2005 to April 2012, with gaps) of wet Hg deposition measurements at a tropical wet forest in the Luquillo Mountains, northeastern Puerto Rico, U.S. Despite receiving unpolluted air off the Atlantic Ocean from northeasterly trade winds, during two complete years the site averaged 27.9 μg m(-2) yr(-1) wet Hg deposition, or about 30% more than Florida and the Gulf Coast, the highest deposition areas within the U.S. These high Hg deposition rates are driven in part by high rainfall, which averaged 2855 mm yr(-1). The volume-weighted mean Hg concentration was 9.8 ng L(-1), and was highest during summer and lowest during the winter dry season. Rainout of Hg (decreasing concentration with increasing rainfall depth) was minimal. The high Hg deposition was not supported by gaseous oxidized mercury (GOM) at ground level, which remained near global background concentrations (<10 pg m(-3)). Rather, a strong positive correlation between Hg concentrations and the maximum height of rain detected within clouds (echo tops) suggests that droplets in high convective cloud tops scavenge GOM from above the mixing layer. The high wet Hg deposition at this "clean air" site suggests that other tropical areas may be hotspots for Hg deposition as well.
Mackus, A.J.M.; Mulders, J.J.L.; Sanden, van de M.C.M.; Kessels, W.M.M.
2010-01-01
An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure,
Tetrasilane and digermane for the ultra-high vacuum chemical vapor deposition of SiGe alloys
International Nuclear Information System (INIS)
Hart, John; Hazbun, Ramsey; Eldridge, David; Hickey, Ryan; Fernando, Nalin; Adam, Thomas; Zollner, Stefan; Kolodzey, James
2016-01-01
Tetrasilane and digermane were used to grow epitaxial silicon germanium layers on silicon substrates in a commercial ultra-high vacuum chemical vapor deposition tool. Films with concentrations up to 19% germanium were grown at temperatures from 400 °C to 550 °C. For all alloy compositions, the growth rates were much higher compared to using mono-silane and mono-germane. The quality of the material was assessed using X-ray diffraction, atomic force microscopy, and spectroscopic ellipsometry; all indicating high quality epitaxial films with low surface roughness suitable for commercial applications. Studies of the decomposition kinetics with regard to temperature were performed, revealing an unusual growth rate maximum between the high and low temperature deposition regimes. - Highlights: • Higher order precursors tetrasilane and digermane • Low temperature deposition • Thorough film characterization with temperature • Arrhenius growth rate peak
A prediction method for the wax deposition rate based on a radial basis function neural network
Directory of Open Access Journals (Sweden)
Ying Xie
2017-06-01
Full Text Available The radial basis function neural network is a popular supervised learning tool based on machinery learning technology. Its high precision having been proven, the radial basis function neural network has been applied in many areas. The accumulation of deposited materials in the pipeline may lead to the need for increased pumping power, a decreased flow rate or even to the total blockage of the line, with losses of production and capital investment, so research on predicting the wax deposition rate is significant for the safe and economical operation of an oil pipeline. This paper adopts the radial basis function neural network to predict the wax deposition rate by considering four main influencing factors, the pipe wall temperature gradient, pipe wall wax crystal solubility coefficient, pipe wall shear stress and crude oil viscosity, by the gray correlational analysis method. MATLAB software is employed to establish the RBF neural network. Compared with the previous literature, favorable consistency exists between the predicted outcomes and the experimental results, with a relative error of 1.5%. It can be concluded that the prediction method of wax deposition rate based on the RBF neural network is feasible.
Improving chemical solution deposited YBa 2Cu 3O 7- δ film properties via high heating rates
Siegal, M. P.; Dawley, J. T.; Clem, P. G.; Overmyer, D. L.
2003-12-01
The superconducting and structural properties of YBa 2Cu 3O 7- δ (YBCO) films grown from chemical solution deposited (CSD) metallofluoride-based precursors improve by using high heating rates to the desired growth temperature. This is due to avoiding the nucleation of undesirable a-axis grains at lower temperatures, from 650 to 800 °C in p(O 2)=0.1%. Minimizing time spent in this range during the temperature ramp of the ex situ growth process depresses a-axis grain growth in favor of the desired c-axis orientation. Using optimized conditions, this results in high-quality YBCO films on LaAlO 3(1 0 0) with Jc(77 K) ∼ 3 MA/cm 2 for films thicknesses ranging from 60 to 140 nm. In particular, there is a dramatic decrease in a-axis grains in coated-conductors grown on CSD Nb-doped SrTiO 3(1 0 0) buffered Ni(1 0 0) tapes.
Gas flow rate and powder flow rate effect on properties of laser metal deposited Ti6Al4V
CSIR Research Space (South Africa)
Pityana, S
2013-03-01
Full Text Available . The powder flow rate and the gas flow rate were varied to study their effect on the physical, metallurgical and mechanical properties of the deposits. The physical properties studied are: the track width, the track height and the deposit weight...
Directory of Open Access Journals (Sweden)
Shun-Wei Liu
2014-01-01
Full Text Available We demonstrated a fabrication technique to reduce the driving voltage, increase the current efficiency, and extend the operating lifetime of an organic light-emitting diode (OLED by simply controlling the deposition rate of bis(10-hydroxybenzo[h]qinolinato beryllium (Bebq2 used as the emitting layer and the electron-transport layer. In our optimized device, 55 nm of Bebq2 was first deposited at a faster deposition rate of 1.3 nm/s, followed by the deposition of a thin Bebq2 (5 nm layer at a slower rate of 0.03 nm/s. The Bebq2 layer with the faster deposition rate exhibited higher photoluminescence efficiency and was suitable for use in light emission. The thin Bebq2 layer with the slower deposition rate was used to modify the interface between the Bebq2 and cathode and hence improve the injection efficiency and lower the driving voltage. The operating lifetime of such a two-step deposition OLED was 1.92 and 4.6 times longer than that of devices with a single deposition rate, that is, 1.3 and 0.03 nm/s cases, respectively.
High mercury wet deposition at a “clean Air” site in Puerto Rico
Shanley, James B.; Engle, Mark A.; Scholl, Martha A.; Krabbenhoft, David P.; Brunette, Robert; Olson, Mark L.; Conroy, Mary E.
2015-01-01
Atmospheric mercury deposition measurements are rare in tropical latitudes. Here we report on seven years (April 2005 to April 2012, with gaps) of wet Hg deposition measurements at a tropical wet forest in the Luquillo Mountains, northeastern Puerto Rico, U.S. Despite receiving unpolluted air off the Atlantic Ocean from northeasterly trade winds, during two complete years the site averaged 27.9 μg m–2 yr–1 wet Hg deposition, or about 30% more than Florida and the Gulf Coast, the highest deposition areas within the U.S. These high Hg deposition rates are driven in part by high rainfall, which averaged 2855 mm yr–1. The volume-weighted mean Hg concentration was 9.8 ng L–1, and was highest during summer and lowest during the winter dry season. Rainout of Hg (decreasing concentration with increasing rainfall depth) was minimal. The high Hg deposition was not supported by gaseous oxidized mercury (GOM) at ground level, which remained near global background concentrations (<10 pg m–3). Rather, a strong positive correlation between Hg concentrations and the maximum height of rain detected within clouds (echo tops) suggests that droplets in high convective cloud tops scavenge GOM from above the mixing layer. The high wet Hg deposition at this “clean air” site suggests that other tropical areas may be hotspots for Hg deposition as well.
Deposition of highly (111)-oriented PZT thin films by using metal organic chemical deposition
Bu, K H; Choi, D K; Seong, W K; Kim, J D
1999-01-01
Lead zirconate titanate (PZT) thin films have been grown on Pt/Ta/SiNx/Si substrates by using metal organic chemical vapor deposition with Pb(C sub 2 H sub 5) sub 4 , Zr(O-t-C sub 4 H sub 9) sub 4 , and Ti(O-i-C sub 3 H sub 7) sub 4 as source materials and O sub 2 as an oxidizing gas. The Zr fraction in the thin films was controlled by varying the flow rate of the Zr source material. The crystal structure and the electrical properties were investigated as functions of the composition. X-ray diffraction analysis showed that at a certain range of Zr fraction, highly (111)-oriented PZT thin films with no pyrochlore phases were deposited. On the other hand, at low Zr fractions, there were peaks from Pb-oxide phases. At high Zr fractions, peaks from pyrochlore phase were seen. The films also showed good electrical properties, such as a high dielectric constant of more than 1200 and a low coercive voltage of 1.35 V.
76 FR 41392 - Interest on Deposits; Deposit Insurance Coverage
2011-07-14
... banks' funding costs and also allow them to plan business growth more dependably and rigorously... of business deposits by offering continually higher rates of interest. Three of the four contended... deposits. They reasoned that large banks will offer high rates of interest and lure away business...
ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques
Energy Technology Data Exchange (ETDEWEB)
Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)
2014-05-15
Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.
Relative Impacts of Low Permeability Subsurface Deposits on Recharge Basin Infiltration Rates
Oconnell, P.; Becker, M.; Pham, C.; Rodriguez, G.; Hutchinson, A.; Plumlee, M.
2017-12-01
Artificial recharge of aquifers through spreading basins has become an important component of water management in semi-arid climates. The rate at which water can be recharged in these basins is limited by the natural vertical permeability of the underlying deposits which may be highly variable both laterally and vertically. To help understand hydrostratigraphic controls on recharge, a newly constructed basin was surveyed and instrumented. Prior to flooding the basin, lithology was characterized by shallow hand coring, direct push coring, ground penetrating radar, and electrical resistivity. After flooding, recharge was monitored through piezometers, electrical resistivity, and a network of fiber optic distributed temperature sensing (DTS). The DTS network used temperature as a tracer to measure infiltration rate on 25 cm intervals both laterally and vertically. Several hundred paired DTS time series datasets (from fiber optic cables located at 0 and 0.5 meters below ground surface) were processed with the cross-wavelet transform (XWT) to calculate spatially and temporally continuous infiltration rates, which can be interpolated and animated to visualize heterogeneity. Time series data from 8-meter deep, vertically oriented DTS cables reveal depth intervals where infiltration rates vary. Inverted resistivity sections from repeated dipole-dipole surveys along the sidewall of a spreading basin exhibit a positive correlation with the distribution of relatively high and low infiltration rates, indicating zones of preferential downward (efficient) and lateral (inefficient) flow, respectively. In contrast to other monitored basins, no perching was observed in the vertically oriented DTS cables. The variation in recharge across the basin and the appearance of subsurface lateral flow can be explained in context of the alluvial depositional environment.
The effect of changing the magnetic field strength on HiPIMS deposition rates
International Nuclear Information System (INIS)
Bradley, J W; Mishra, A; Kelly, P J
2015-01-01
The marked difference in behaviour between HiPIMS and conventional dc or pulsed-dc magnetron sputtering discharges with changing magnetic field strengths is demonstrated through measurements of deposition rate. To provide a comparison between techniques the same circular magnetron was operated in the three excitation modes at a fixed average power of 680 W and a pressure of 0.54 Pa in the non-reactive sputtering of titanium. The total magnetic field strength B at the cathode surface in the middle of the racetrack was varied from 195 to 380 G. DC and pulsed-dc discharges show the expected behaviour that deposition rates fall with decreasing B (here by ∼25–40%), however the opposite trend is observed in HiPIMS with deposition rates rising by a factor of 2 over the same decrease in B.These observations are understood from the stand point of the different composition and transport processes of the depositing metal flux between the techniques. In HiPIMS, this flux is largely ionic and slow post-ionized sputtered particles are subject to strong back attraction to the target by a retarding plasma potential structure ahead of them. The height of this potential barrier is known to increase with increasing B.From a simple phenomenological model of the sputtered particles fluxes, and using the measured deposition rates from the different techniques as inputs, the combined probabilities of ionization, α, and back attraction, β, of the metal species in HiPIMS has been calculated. There is a clear fall in αβ (from ∼0.9 to ∼0.7) with decreasing B-field strengths, we argue primarily due to a weakening of electrostatic ion back attraction, so leading to higher deposition rates. The results indicate that careful design of magnetron field strengths should be considered to optimise HiPIMS deposition rates. (paper)
Confined high-pressure chemical deposition of hydrogenated amorphous silicon.
Baril, Neil F; He, Rongrui; Day, Todd D; Sparks, Justin R; Keshavarzi, Banafsheh; Krishnamurthi, Mahesh; Borhan, Ali; Gopalan, Venkatraman; Peacock, Anna C; Healy, Noel; Sazio, Pier J A; Badding, John V
2012-01-11
Hydrogenated amorphous silicon (a-Si:H) is one of the most technologically important semiconductors. The challenge in producing it from SiH(4) precursor is to overcome a significant kinetic barrier to decomposition at a low enough temperature to allow for hydrogen incorporation into a deposited film. The use of high precursor concentrations is one possible means to increase reaction rates at low enough temperatures, but in conventional reactors such an approach produces large numbers of homogeneously nucleated particles in the gas phase, rather than the desired heterogeneous deposition on a surface. We report that deposition in confined micro-/nanoreactors overcomes this difficulty, allowing for the use of silane concentrations many orders of magnitude higher than conventionally employed while still realizing well-developed films. a-Si:H micro-/nanowires can be deposited in this way in extreme aspect ratio, small-diameter optical fiber capillary templates. The semiconductor materials deposited have ~0.5 atom% hydrogen with passivated dangling bonds and good electronic properties. They should be suitable for a wide range of photonic and electronic applications such as nonlinear optical fibers and solar cells. © 2011 American Chemical Society
Determination of Redistribution of Erosion/Deposition Rate in Cultivated Area Using 137Cs Technique
International Nuclear Information System (INIS)
Nita Suhartini; Syamsul Abbas RAS; Barokah A; Ali Arman L
2004-01-01
The aim of the research is to determine the rate of redistribution of erosion/deposition in cultivated area. The application of 137 Cs technique was carried out at cultivated area in Bojong - Ciawi, with slope less than 10 o and slope length of about 2 km. A reference site was selected at the top of the slope, and this site is flat, open and covered with grass. Two sites in the cultivated area were selected as study site namely LU-I ( 15 x 25 ) m with the distance of 1000 m from the top, and LU-II (17.5 x 20) m with the distance of 1300 m from the top. Sampling of soil at reference site was done by using scraper (20 x 50) cm, while sampling at study site by using core sampling (di = 7 cm). Soil samples were brought to the laboratorium for preparation and analysis of 137 Cs content. Preparation are including of drying, weighing the total dry, sieving and crushing. Analysis of 137 Cs content was done using multi channel analyzer (MCA) that connected to high purity germanium (HPGe), at 661 keV, and the minimum counting time of 16 hours. To estimate the erosion/deposit rate, two mathematical model were used, namely Proportional Model (PM) and Mass Balance Model 1 (MBM1). The result for application of 137 Cs technique showed that MBM1 gives somewhat higher value for deposit rate and somewhat lower value for erosion than PM. Land use - I (LU-I) of Bojong - Ciawi was suffering from erosion with the erosion rate from 1 t/(ha.y) to 13 t/(ha.y), and LU-II has deposit rate from 1 t/(ha.y) to 50 t/(ha.y). (author)
International Nuclear Information System (INIS)
Damsohn, M.; Prasser, H.-M.
2011-01-01
Highlights: → Development of a sensor for time- and space-resolved droplet deposition in annular flow. → Experimental measurement of droplet deposition in horizontal annular flow to compare readings of the sensor with images of a high-speed camera when droplets are depositing unto the liquid film. → Self-adaptive signal filter based on autoregression to separate droplet impacts in the sensor signal from waves of liquid films. - Abstract: A sensor based on the electrical conductance method is presented for the measurement of dynamic liquid films in two-phase flow. The so called liquid film sensor consists of a matrix with 64 x 16 measuring points, a spatial resolution of 3.12 mm and a time resolution of 10 kHz. Experiments in a horizontal co-current air-water film flow were conducted to test the capability of the sensor to detect droplet deposition from the gas core onto the liquid film. The experimental setup is equipped with the liquid film sensor and a high speed camera (HSC) recording the droplet deposition with a sampling rate of 10 kHz simultaneously. In some experiments the recognition of droplet deposition on the sensor is enhanced by marking the droplets with higher electrical conductivity. The comparison between the HSC and the sensor shows, that the sensor captures the droplet deposition above a certain droplet diameter. The impacts of droplet deposition can be filtered from the wavy structures respectively conductivity changes of the liquid film using a filter algorithm based on autoregression. The results will be used to locally measure droplet deposition e.g. in the proximity of spacers in a subchannel geometry.
Inkwells for on-demand deposition rate measurement in aerosol-jet based 3D printing
International Nuclear Information System (INIS)
Gu, Yuan; Das, Siddhartha; Gutierrez, David; Hines, D R
2017-01-01
Aerosol-jet printing (AJP) is an important direct-write printing technology based on additive manufacturing methods. Numerous research groups have utilized AJP for the fabrication of electronic circuits and devices. However, there has not been any real-time or even any on-demand method for quantitatively measuring and/or setting the deposition rate of an AJ ink stream. In this paper, we present a method for measuring the deposition rate of an AJ ink stream by printing into an array of inkwells that were fabricated using photolithography and were characterized using x-ray tomography and optical profilometry. These inkwell arrays were then used to establish a set of deposition rates namely 0.0011, 0.0024, 0.0035, 0.0046 and 0.0059 mm 3 s −1 that were subsequently compared with independently-measured deposition rates obtained by printing the ink stream into a weighing pan for a specified time and calculating the resulting deposition rate from the weight of the printed sample. From this comparison, it is observed that, for a human operator, the error in setting a specific deposition rate is less for inkwell fill times greater than 3 s and greater for fill times less than 3 s. This observation indicates that the average volume of an inkwell array should be at least three times the desired deposition rate ( V inkwell > 3 R ). It was also observed that when the diameter of the inkwell was only slightly larger than the ink stream diameter, the ink uniformly wets the sidewall of the inkwell and results in a well filled inkwell for which the point at which it is just fully filled is easily observable. Finally, the interactions of the ink with both ‘philic’ and ‘phobic’ inkwells were studied illustrating the ability to use inkwells of various materials for setting the desired deposition rates for a variety of AJ printable inks. (technical note)
Directory of Open Access Journals (Sweden)
Jankovskiy Stanislav
2015-01-01
Full Text Available Experimental research of heating rate influence on coal samples gasification process of Krasnogorsky and Borodinsky coal deposit ranks A and 2B was done to define optimal heating mode in high intensification of dispersal of inflammable gases conditions. Abundance ratio of carbon monoxide and nitrogen monoxide, water vapor, carbon dioxide at four values of heating rate within the range of 5 to 30 K/min. with further definition of optimal heating rate of coals was stated.
Sediment deposition rate in the Falefa River basin, Upolu Island, Samoa
International Nuclear Information System (INIS)
Terry, James P.; Kostaschuk, Ray A.; Garimella, Sitaram
2006-01-01
The 137 Cs method was employed to investigate the recent historical rate of sediment deposition on a lowland alluvial floodplain in the Falefa River basin, Upolu Island, Samoa. Caesium stratigraphy in the floodplain sediment profile was clearly defined, with a broad peak at 145-175 cm depth. The measured rate of vertical accretion over the last 40 years is 4.0 ± 0.4 cm per year. This rate exceeds observations in humid environments elsewhere, but is similar to that recorded on other tropical Pacific Islands. Available flow data for the Vaisigano River in Samoa give a 'near-catastrophic' index value of 0.6 for flood variability. This is associated with the occurrence of tropical cyclones and storms in the Samoa area. Large floods therefore probably contribute to the high rate of floodplain sedimentation on Upolu Island. A small but growing body of evidence suggests that fluvial sedimentation rates on tropical Pacific islands are some of the highest in the world
A robust upscaling of the effective particle deposition rate in porous media
Boccardo, Gianluca; Crevacore, Eleonora; Sethi, Rajandrea; Icardi, Matteo
2018-05-01
In the upscaling from pore to continuum (Darcy) scale, reaction and deposition phenomena at the solid-liquid interface of a porous medium have to be represented by macroscopic reaction source terms. The effective rates can be computed, in the case of periodic media, from three-dimensional microscopic simulations of the periodic cell. Several computational and semi-analytical models have been studied in the field of colloid filtration to describe this problem. They typically rely on effective deposition rates defined by complex fitting procedures, neglecting the advection-diffusion interplay, the pore-scale flow complexity, and assuming slow reactions (or large Péclet numbers). Therefore, when these rates are inserted into general macroscopic transport equations, they can lead to several conceptual inconsistencies and significant errors. To study more accurately the dependence of deposition on the flow parameters, in this work we advocate a clear distinction between the surface processes (that altogether defines the so-called attachment efficiency), and the pore-scale processes. With this approach, valid when colloidal particles are small enough, we study Brownian and gravity-driven deposition on a face-centred cubic (FCC) arrangement of spherical grains, and define a robust upscaling based on a linear effective reaction rate. The case of partial deposition, defined by an attachment probability, is studied and the limit of perfect sink is retrieved as a particular case. We introduce a novel upscaling approach and a particularly convenient computational setup that allows the direct computation of the asymptotic stationary value of effective rates. This allows to drastically reduce the computational domain down to the scale of the single repeating periodic unit. The savings are ever more noticeable in the case of higher Péclet numbers, when larger physical times are needed to reach the asymptotic regime and thus, equivalently, much larger computational domain and
Kim, Jongmin; Weimer, Jeffrey J.; Zukic, Muamer; Torr, Douglas G.
1994-01-01
The oxidation of aluminum thin films deposited in a conventional high vacuum chamber has been investigated using x-ray photoelectron spectroscopy (XPS) and depth profiling. The state of the Al layer was preserved by coating it with a protective MgF2 layer in the deposition chamber. Oxygen concentrations in the film layers were determined as a function of sputter time (depth into the film). The results show that an oxidized layer is formed at the start of Al deposition and that a less extensively oxidized Al layer is deposited if the deposition rate is fast. The top surface of the Al layer oxidizes very quickly. This top oxidized layer may be thicker than has been previously reported by optical methods. Maximum oxygen concentrations measured by XPS at each Al interface are related to pressure to rate ratios determined during the Al layer deposition.
Achieving high mobility ZnO : Al at very high growth rates by dc filtered cathodic arc deposition
International Nuclear Information System (INIS)
Mendelsberg, R J; Lim, S H N; Wallig, J; Anders, A; Zhu, Y K; Milliron, D J
2011-01-01
Achieving a high growth rate is paramount for making large-area transparent conducting oxide coatings at a low cost. Unfortunately, the quality of thin films grown by most techniques degrades as the growth rate increases. Filtered dc cathodic arc is a lesser known technique which produces a stream of highly ionized plasma, in stark contrast to the neutral atoms produced by standard sputter sources. Ions bring a large amount of potential energy to the growing surface which is in the form of heat, not momentum. By minimizing the distance from cathode to substrate, the high ion flux gives a very high effective growth temperature near the film surface without causing damage from bombardment. The high surface temperature is a direct consequence of the high growth rate and allows for high-quality crystal growth. Using this technique, 500-1300 nm thick and highly transparent ZnO : Al films were grown on glass at rates exceeding 250 nm min -1 while maintaining resistivity below 5 x 10 -4 Ω cm with electron mobility as high as 60 cm 2 V -1 s -1 . (fast track communication)
Particle deposition in low-speed, high-turbulence flows
DEFF Research Database (Denmark)
Reck, Mads; Larsen, Poul Scheel; Ullum, U.
2002-01-01
The experimental and numerical study considers the concentration of airborne particulate contaminants, such as spores of spoilage fungi, and their deposition on a surface, in a petri dish, and on a warm box-shaped product placed in a food-processing environment. Field measurements by standard...... field measurements. Particle deposition is shown to be associated with near-wall coherent structures. Flow reversal, simulated by impulsive start, is shown to give higher deposition rates than steady mean flows. Key word index: Spoilage fungi; spores; food processing plant; deposition flux; large eddy...
Uronide Deposition Rates in the Primary Root of Zea mays1
Silk, Wendy Kuhn; Walker, Robert C.; Labavitch, John
1984-01-01
The spatial distribution of the rate of deposition of uronic acids in the elongation zone of Zea mays L. Crow WF9 × Mo 17 was determined using the continuity equation with experimentally determined values for uronide density and growth velocity. In spatial terms, the uronide deposition rate has a maximum of 0.4 micrograms per millimeter per hour at s = 3.5 mm (i.e., at the location 3.5 mm from the root tip) and decreases to 0.1 mg mm−1 h−1 by s = 10 mm. In terms of a material tissue element, a tissue segment located initially from s = 2.0 to s = 2.1 mm has 0.14 μg of uronic acids and increases in both length and uronic acid content until it is 0.9 mm long and has 0.7 μg of uronide when its center is at s = 10 mm. Simulations of radioactive labeling experiments show that 15 min is the appropriate time scale for pulse determinations of deposition rate profiles in a rapidly growing corn root. PMID:16663488
Bismuth nanowire growth under low deposition rate and its ohmic contact free of interface damage
Directory of Open Access Journals (Sweden)
Ye Tian
2012-03-01
Full Text Available High quality bismuth (Bi nanowire and its ohmic contact free of interface damage are quite desired for its research and application. In this paper, we propose one new way to prepare high-quality single crystal Bi nanowires at a low deposition rate, by magnetron sputtering method without the assistance of template or catalyst. The slow deposition growth mechanism of Bi nanowire is successfully explained by an anisotropic corner crossing effect, which is very different from existing explanations. A novel approach free of interface damage to ohmic contact of Bi nanowire is proposed and its good electrical conductivity is confirmed by I-V characteristic measurement. Our method provides a quick and convenient way to produce high-quality Bi nanowires and construct ohmic contact for desirable devices.
Hydrogen retention properties of co-deposition under high-density plasmas in TRIAM-1M
International Nuclear Information System (INIS)
Tokitani, M.; Miyamoto, M.; Tokunaga, K.; Fujiwara, T.; Yoshida, N.; Sakamoto, M.; Zushi, H.; Hanada, K.; TRIAM Group,; Nagata, S.; Tsuchiya, B.
2007-01-01
Retention of hydrogen in co-deposits formed under high-density plasma discharge in TRIAM-1M was studied. In order to quantify the retained hydrogen, material probe experiments were performed under the high-density (n at e ∼10 19 m -3 ) discharges. After the exposure to the plasma, the quantitative analysis of deposition, hydrogen retention, and microscopic modification of specimens were performed by means of ion beam analysis and transmission electron microscopy. The co-deposits mainly consisted of Mo. The deposition rate of Mo was about ten times higher than that of the low-density discharge case. The hydrogen concentrations (H/Mo) retained in the co-deposits were 0.06-0.17, which was much higher than that in bulk-Mo and almost equal to the low-density case. These results indicate that as long as the co-deposition layers are continuously formed, strong wall pumping in TRIAM-1M is maintained during the discharges
Mahamood, Rasheedat M.
2018-03-01
Laser metal deposition (LMD) process belongs to the directed energy deposition class of additive manufacturing processes. It is an important manufacturing technology with lots of potentials especially for the automobile and aerospace industries. The laser metal deposition process is fairly new, and the process is very sensitive to the processing parameters. There is a high level of interactions among these process parameters. The surface finish of part produced using the laser metal deposition process is dependent on the processing parameters. Also, the economy of the LMD process depends largely on steps taken to eliminate or reduce the need for secondary finishing operations. In this study, the influence of laser power and gas flow rate on the microstructure, microhardness and surface finish produced during the laser metal deposition of Ti6Al4V was investigated. The laser power was varied between 1.8 kW and 3.0 kW, while the gas flow rate was varied between 2 l/min and 4 l/min. The microstructure was studied under an optical microscope, the microhardness was studied using a Metkon microhardness indenter, while the surface roughness was studied using a Jenoptik stylus surface analyzer. The results showed that better surface finish was produced at a laser power of 3.0 kW and a gas flow rate of 4 l/min.
Fair premium rate of the deposit insurance system based on banks' creditworthiness
Yoshino, Naoyuki; Taghizadeh-Hesary, Farhad; Nili, Farhad
2017-01-01
Purpose: Deposit insurance is a key element in modern banking, as it guarantees the financial safety of deposits at depository financial institutions. It is necessary to have at least a dual fair premium rate system based on the creditworthiness of financial institutions, as considering a singular premium system for all banks will have a moral hazard. In this paper, we develop a theoretical as well as an empirical model for calculating dual fair premium rates. Design/methodology/approach: Our...
State of the art in thin film thickness and deposition rate monitoring sensors
International Nuclear Information System (INIS)
Buzea, Cristina; Robbie, Kevin
2005-01-01
In situ monitoring parameters are indispensable for thin film fabrication. Among them, thickness and deposition rate control are often the most important in achieving the reproducibility necessary for technological exploitation of physical phenomena dependent on film microstructure. This review describes the types of thickness and deposition rate sensors and their theoretical and phenomenological background, underlining their performances, as well as advantages and disadvantages
Investigations into the effect of spinel oxide composition on rate of carbon deposition
International Nuclear Information System (INIS)
Allen, G.C.; Jutson, J.A.
1987-11-01
The deposition of carbon on fuel cladding and other steels results in a reduction in heat transfer efficiency. Methane and carbon monoxide are added to the gaseous coolant in the Advanced Gas Cooled Reactor (AGR) to reduce the radiolytic oxidation of the graphite moderator and this is known to increase the rate of carbon deposition. However, the composition of oxides formed on steel surfaces within the reactor may also influence deposition. In this investigation carefully characterised spinel type oxides of varying composition have been subjected to γ radiation under conditions of temperature, pressure and atmosphere similar to those experienced in the reactor. The rate of carbon deposition has been studied using Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray Analysis (EDX). (U.K.)
Dispersal distances for airborne spores based on deposition rates and stochastic modeling
DEFF Research Database (Denmark)
Stockmarr, Anders; Andreasen, Viggo; Østergård, Hanne
2007-01-01
in terms of time to deposition, and show how this concept is equivalent to the deposition rate for fungal spores. Special cases where parameter values for wind and gravitation lead to exponentially or polynomially decreasing densities are discussed, and formulas for one- and two-dimensional densities...
International Nuclear Information System (INIS)
Muto, Y.; Nakatomi, S.; Oka, N.; Iwabuchi, Y.; Kotsubo, H.; Shigesato, Y.
2012-01-01
Ta-doped SnO 2 films were deposited on glass substrate (either unheated or heated at 200 °C) by reactive magnetron sputtering with a Sn–Ta metal-sintered target using a plasma control unit (PCU) and mid-frequency (mf, 50 kHz) unipolar pulsing. The PCU feedback system precisely controlled the flow of the reactive and sputtering gases (O 2 and Ar, respectively) by monitoring either discharge impedance or the plasma emission of the atomic O* line at 777 nm. The planar target was connected to the switching unit, which was operated in unipolar pulse mode. Power density on the target was maintained at 4.4 W cm −2 during deposition. The lowest obtained resistivity for the films deposited on heated substrate was 6.4 × 10 −3 Ωcm, where the deposition rate was 250 nm min −1 .
Properties of indium tin oxide films deposited using High Target Utilisation Sputtering
International Nuclear Information System (INIS)
Calnan, S.; Upadhyaya, H.M.; Thwaites, M.J.; Tiwari, A.N.
2007-01-01
Indium tin oxide (ITO) films were deposited on soda lime glass and polyimide substrates using an innovative process known as High Target Utilisation Sputtering (HiTUS). The influence of the oxygen flow rate, substrate temperature and sputtering pressure, on the electrical, optical and thermal stability properties of the films was investigated. High substrate temperature, medium oxygen flow rate and moderate pressure gave the best compromise of low resistivity and high transmittance. The lowest resistivity was 1.6 x 10 -4 Ω cm on glass while that on the polyimide was 1.9 x 10 -4 Ω cm. Substrate temperatures above 100 deg. C were required to obtain visible light transmittance exceeding 85% for ITO films on glass. The thermal stability of the films was mainly influenced by the oxygen flow rate and thus the initial degree of oxidation. The film resistivity was either unaffected or reduced after heating in vacuum but generally increased for oxygen deficient films when heated in air. The greatest increase in transmittance of oxygen deficient films occurred for heat treatment in air while that of the highly oxidised films was largely unaffected by heating in both media. This study has demonstrated the potential of HiTUS as a favourable deposition method for high quality ITO suitable for use in thin film solar cells
Estimating dual deposit insurance premium rates and forecasting non-performing loans: Two new models
Yoshino, Naoyuki; Taghizadeh-Hesary, Farhad; Nili, Farhad
2015-01-01
Risky banks that endanger the stability of the financial system should pay higher deposit insurance premiums than healthy banks and other financial institutions that have shown good financial performance. It is necessary, therefore, to have at least a dual fair premium rate system. In this paper, we develop a model for calculating dual fair premium rates. Our definition of a fair premium rate in this paper is a rate that could cover the operational expenditures of the deposit insuring organiz...
Koivisto, Antti J; Jensen, Alexander C Ø; Kling, Kirsten I; Kling, Jens; Budtz, Hans Christian; Koponen, Ismo K; Tuinman, Ilse; Hussein, Tareq; Jensen, Keld A; Nørgaard, Asger; Levin, Marcus
2018-01-05
Here, we studied the particle release rate during Electrostatic spray deposition of anatase-(TiO 2 )-based photoactive coating onto tiles and wallpaper using a commercially available electrostatic spray device. Spraying was performed in a 20.3m 3 test chamber while measuring concentrations of 5.6nm to 31μm-size particles and volatile organic compounds (VOC), as well as particle deposition onto room surfaces and on the spray gun user hand. The particle emission and deposition rates were quantified using aerosol mass balance modelling. The geometric mean particle number emission rate was 1.9×10 10 s -1 and the mean mass emission rate was 381μgs -1 . The respirable mass emission-rate was 65% lower than observed for the entire measured size-range. The mass emission rates were linearly scalable (±ca. 20%) to the process duration. The particle deposition rates were up to 15h -1 for deposited particles consisted of mainly TiO 2 , TiO 2 mixed with Cl and/or Ag, TiO 2 particles coated with carbon, and Ag particles with size ranging from 60nm to ca. 5μm. As expected, no significant VOC emissions were observed as a result of spraying. Finally, we provide recommendations for exposure model parameterization. Copyright © 2017 The Author(s). Published by Elsevier B.V. All rights reserved.
Impact of future Arctic shipping on high-latitude black carbon deposition (Invited)
Corbett, J. J.; Browse, J.; Carslaw, K. S.; Schmidt, A.
2013-12-01
The retreat of Arctic sea-ice has led to renewed calls to exploit Arctic shipping routes. The diversion of ship traffic through the Arctic will shorten shipping routes and possibly reduce global shipping emissions. However, deposition of black carbon (BC) aerosol emitted by additional Arctic ships could cause a reduction in the albedo of snow and ice, accelerating snow-melt and sea-ice loss. We use recently compiled Arctic shipping emission inventories for 2004 and 2050 together with a global aerosol microphysics model GLOMAP coupled to the chemical transport model TOMCAT to quantify the contribution of future Arctic shipping to high-latitude BC deposition. Emission rates of SOx (SO2 and SO4) and particulate matter (PM) were estimated for 2050 under both business-as-usual and high-growth scenarios. BC particles are assumed to be water-insoluble at emission but can become active in cloud drop formation through soluble material accumulation. After BC particles become cloud-active they are more efficiently wet scavenged, which accounts for 80% of modeled BC deposition. Current-day Arctic shipping contributes 0.3% to the BC mass deposited north of 60N (250 Gg). About 50% of modelled BC deposition is on open ocean, suggesting that current Arctic ship traffic may not significantly contribute to BC deposition on central Arctic sea ice. However, 6 - 8% of deposited BC on the west coast of Greenland originates from local ship traffic. Moreover, in-Arctic shipping contributes some 32% to high-latitude ship-sourced deposition despite accounting for less than 1.0% of global shipping emissions. This suggests that control of in-Arctic shipping BC emissions could yield greater decrease in high-latitude BC deposition than a similar control strategy applied only to the extra-Arctic shipping industry. Arctic shipping in 2050 will contribute less than 1% to the total BC deposition north of 60N due to the much greater relative contribution of BC transported from non-shipping sources
Enthalpy and high temperature relaxation kinetics of stable vapor-deposited glasses of toluene
International Nuclear Information System (INIS)
Bhattacharya, Deepanjan; Sadtchenko, Vlad
2014-01-01
Stable non-crystalline toluene films of micrometer and nanometer thicknesses were grown by vapor deposition at distinct rates and probed by fast scanning calorimetry. Fast scanning calorimetry is shown to be extremely sensitive to the structure of the vapor-deposited phase and was used to characterize simultaneously its kinetic stability and its thermodynamic properties. According to our analysis, transformation of vapor-deposited samples of toluene during heating with rates in excess 10 5 K s −1 follows the zero-order kinetics. The transformation rate correlates strongly with the initial enthalpy of the sample, which increases with the deposition rate according to sub-linear law. Analysis of the transformation kinetics of vapor-deposited toluene films of various thicknesses reveal a sudden increase in the transformation rate for films thinner than 250 nm. The change in kinetics seems to correlate with the surface roughness scale of the substrate. The implications of these findings for the formation mechanism and structure of vapor-deposited stable glasses are discussed
High-rate reactive magnetron sputtering of zirconia films for laser optics applications
International Nuclear Information System (INIS)
Juskevicius, K.; Subacius, A.; Drazdys, R.; Juskenas, R.; Audronis, M.; Matthews, A.; Leyland, A.
2014-01-01
ZrO 2 exhibits low optical absorption in the near-UV range and is one of the highest laser-induced damage threshold (LIDT) materials; it is, therefore, very attractive for laser optics applications. This paper reports explorations of reactive sputtering technology for deposition of ZrO 2 films with low extinction coefficient k values in the UV spectrum region at low substrate temperature. A high deposition rate (64 % of the pure metal rate) process is obtained by employing active feedback reactive gas control which creates a stable and repeatable deposition processes in the transition region. Substrate heating at 200 C was found to have no significant effect on the optical ZrO 2 film properties. The addition of nitrogen to a closed-loop controlled process was found to have mostly negative effects in terms of deposition rate and optical properties. Open-loop O 2 gas-regulated ZrO 2 film deposition is slow and requires elevated (200 C) substrate temperature or post-deposition annealing to reduce absorption losses. Refractive indices of the films were distributed in the range n = 2.05-2.20 at 1,000 nm and extinction coefficients were in the range k = 0.6 x 10 -4 and 4.8 x 10 -3 at 350 nm. X-ray diffraction analysis showed crystalline ZrO 2 films consisted of monoclinic + tetragonal phases when produced in Ar/O 2 atmosphere and monoclinic + rhombohedral or a single rhombohedral phase when produced in Ar/O 2 + N 2 . Optical and physical properties of the ZrO 2 layers produced in this study are suitable for high-power laser applications in the near-UV range. (orig.)
High frequency and large deposition of acid fog on high elevation forest.
Igawa, Manabu; Matsumura, Ko; Okochi, Hiroshi
2002-01-01
We have collected and analyzed fogwater on the mountainside of Mt. Oyama (1252 m) in the Tanzawa Mountains of Japan and observed the fog event frequency from the base of the mountain with a video camera. The fog event frequency increased with elevation and was observed to be present 46% of the year at the summit. The water deposition via throughfall increased with elevation because of the increase in fogwater interception and was about twice that via rain at the summit, where the air pollutant deposition via throughfall was several times that via rainwater. The dry deposition and the deposition via fogwater were dominant factors in the total ion deposition at high elevation sites. In a fog event, nitric acid, the major acid component on the mountain, is formed during the transport of the air mass from the base of the mountain along the mountainside, where gases including nitric acid deposit and are scavenged by fogwater. Therefore, high acidity caused by nitric acid and relatively low ion strength are observed in the fogwater at high elevation sites.
International Nuclear Information System (INIS)
Valdueza-Felip, S.; Ibáñez, J.; Monroy, E.; González-Herráez, M.; Artús, L.; Naranjo, F.B.
2012-01-01
We investigate the influence of a low-growth-rate InN buffer layer on structural and optical properties of wurtzite nanocrystalline InN films deposited on Si(111) substrates by reactive radio-frequency sputtering. The deposition conditions of the InN buffer layer were optimized in terms of morphological and structural quality, leading to films with surface root-mean-square roughness of ∼ 1 nm under low-growth-rate conditions (60 nm/h). The use of the developed InN buffer layer improves the crystalline quality of the subsequent InN thick films deposited at high growth rate (180 nm/h), as confirmed by the narrowing of X-ray diffraction peaks and the increase of the average grain size of the layers. This improvement of the structural quality is further confirmed by Raman scattering spectroscopy measurements. Room temperature PL emission peaking at ∼ 1.58 eV is observed for InN samples grown with the developed buffer layer. The crystal and optical quality obtained for InN films grown on Si(111) using the low-growth-rate InN buffer layer become comparable to high-quality InN films deposited directly on GaN templates by RF sputtering. - Highlights: ► Improved RF-sputtered InN films on Si(111) using a low-growth-rate InN buffer layer. ► Enhanced structural quality confirmed by X-ray diffraction and Raman measurements. ► Room-temperature photoluminescence emission at 1.58 eV. ► InN films deposited with buffer layer on Si comparable to InN LAYERS on GaN templates.
Energy Technology Data Exchange (ETDEWEB)
Valdueza-Felip, S., E-mail: sirona.valdueza@depeca.uah.es [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain); Ibanez, J. [Institut de Ciencies de la Terra Jaume Almera, Consejo Superior de Investigaciones Cientificas (CSIC), c/Lluis Sole Sabaris s/n, 08028 Barcelona (Spain); Monroy, E. [CEA-Grenoble, INAC/SP2M/NPSC, 17 rue des Martyrs, 38054 Grenoble cedex 9 (France); Gonzalez-Herraez, M. [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain); Artus, L. [Institut de Ciencies de la Terra Jaume Almera, Consejo Superior de Investigaciones Cientificas (CSIC), c/Lluis Sole Sabaris s/n, 08028 Barcelona (Spain); Naranjo, F.B. [Electronics Dept., Polytechnic School, University of Alcala, Madrid-Barcelona Road, km 33.6, 28871 Alcala de Henares, Madrid (Spain)
2012-01-31
We investigate the influence of a low-growth-rate InN buffer layer on structural and optical properties of wurtzite nanocrystalline InN films deposited on Si(111) substrates by reactive radio-frequency sputtering. The deposition conditions of the InN buffer layer were optimized in terms of morphological and structural quality, leading to films with surface root-mean-square roughness of {approx} 1 nm under low-growth-rate conditions (60 nm/h). The use of the developed InN buffer layer improves the crystalline quality of the subsequent InN thick films deposited at high growth rate (180 nm/h), as confirmed by the narrowing of X-ray diffraction peaks and the increase of the average grain size of the layers. This improvement of the structural quality is further confirmed by Raman scattering spectroscopy measurements. Room temperature PL emission peaking at {approx} 1.58 eV is observed for InN samples grown with the developed buffer layer. The crystal and optical quality obtained for InN films grown on Si(111) using the low-growth-rate InN buffer layer become comparable to high-quality InN films deposited directly on GaN templates by RF sputtering. - Highlights: Black-Right-Pointing-Pointer Improved RF-sputtered InN films on Si(111) using a low-growth-rate InN buffer layer. Black-Right-Pointing-Pointer Enhanced structural quality confirmed by X-ray diffraction and Raman measurements. Black-Right-Pointing-Pointer Room-temperature photoluminescence emission at 1.58 eV. Black-Right-Pointing-Pointer InN films deposited with buffer layer on Si comparable to InN LAYERS on GaN templates.
International Nuclear Information System (INIS)
Yang, Yu-Sen; Huang, Wesley
2010-01-01
Chromium nitride coatings exhibit superior hardness, excellent wear and oxidation resistance, and are widely applied in the die and mold industries. The aim of this study was to investigate magnetic field effects on the deposition rate and surface morphology of chromium nitride coatings deposited by magnetron sputtering. Four types of magnetic field configurations, including the magnetron sputtering system, SNSN, SNNN, and intermediate magnetron modification, are discussed in this paper. SKD11 cold work die steel and a silicon (100) chip were used as substrates in the chromium nitride depositions. The process parameters, such as target current, substrate bias, and the distance between the substrate and target, are at fixed conditions, except for the magnetic arrangement type. The experimental results showed that the deposition rates of the four types of magnetic field configurations were 1.06, 1.38, 1.67 and 1.26 µm h −1 , respectively. In these cases, the SNNN type performs more than 58% faster than the unbalanced magnetron configuration does for the deposition rate. The surface morphology of chromium nitride films was also examined by SEM and is discussed in this paper
Energy Technology Data Exchange (ETDEWEB)
NONE
2000-07-01
This report on behalf of the Swiss Federal Office of Energy (SFOE) describes Phase IV of the project to test the feasibility and usefulness of Very High Frequency (VHF) plasma operation in large-area reactors suitable for the production of solar cell panels using thinly-deposited micro-crystalline silicon films. The report discusses the results of fast-deposition tests and trials using high-current DC arcs and VHF techniques to obtain deposition rates and film quality suitable for industrial processes for the production of thin-film solar cell panels. The effects of alternative plasma chemistry were also studied by adding silicon tetrafluoride to the standard silane/hydrogen mixtures. The report is concluded with calculations for optimum radio-frequency (RF) contact configuration for large area reactors with 1 m{sup 2} electrodes.
Deposit Rate Ceilings as a Tool of Prudential Regulation
Directory of Open Access Journals (Sweden)
Janusz Krajewski
2007-12-01
Full Text Available The purpose of the paper is to present one of prudential regulation instruments in an environment that favors to engage in moral hazard behavior. The last decades proved that there is a link between financial liberalization and banking crises. In order to avoid crises and prevent banks engaging in gambling behavior, the system of prudential regulations has been implemented. The emphasis has been placed on the use of capital requirements, typically using the BIS standard developed in the Basel Accord.As the excessive reliance on capital requirements can become costly for the banks and lead to loose their franchise value and undermine incentives for prudent investing. The instrument that can create the franchise value, i.e. earning profits in the current period and in the future, is a policy of deposit rate controls. In the paper was also revealed why the policy of setting interest rate ceiling on deposits had not achieved its intended objectives, especially in the view of the fail of the Regulation Q policy.
International Nuclear Information System (INIS)
Brenning, N; Huo, C; Raadu, M A; Lundin, D; Helmersson, U; Vitelaru, C; Stancu, G D; Minea, T
2012-01-01
The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared with direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target due to a substantial negative potential profile, sometimes called an extended presheath, from the location of ionization toward the cathode. Recent studies in HiPIMS devices, using floating-emitting and swept-Langmuir probes, show that such extended potential profiles do exist, and that the electric fields E z directed toward the target can be strong enough to seriously reduce ion transport to the substrate. However, they also show that the potential drops involved can vary by up to an order of magnitude from case to case. There is a clear need to understand the underlying mechanisms and identify the key discharge variables that can be used for minimizing the back-attraction. We here present a combined theoretical and experimental analysis of the problem of electric fields E z in the ionization region part of HiPIMS discharges, and their effect on the transport of ionized sputtered material. In particular, we have investigated the possibility of a ‘sweet spot’ in parameter space in which the back-attraction of ionized sputtered material is low. It is concluded that a sweet spot might possibly exist for some carefully optimized discharges, but probably in a rather narrow window of parameters. As a measure of how far a discharge is from such a window, a Townsend product Π Townsend is proposed. A parametric analysis of Π Townsend shows that the search for a sweet spot is complicated by the fact that contradictory demands appear for several of the externally controllable parameters such as high/low working gas pressure, short/long pulse length, high/low pulse power and high/low magnetic field strength. (paper)
International Nuclear Information System (INIS)
Choudhary, Sonal; Blaud, Aimeric; Osborn, A. Mark; Press, Malcolm C.; Phoenix, Gareth K.
2016-01-01
Arctic ecosystems are threatened by pollution from recently detected extreme atmospheric nitrogen (N) deposition events in which up to 90% of the annual N deposition can occur in just a few days. We undertook the first assessment of the fate of N from extreme deposition in High Arctic tundra and are presenting the results from the whole ecosystem "1"5N labelling experiment. In 2010, we simulated N depositions at rates of 0, 0.04, 0.4 and 1.2 g N m"−"2 yr"−"1, applied as "1"5NH_4"1"5NO_3 in Svalbard (79"°N), during the summer. Separate applications of "1"5NO_3"− and "1"5NH_4"+ were also made to determine the importance of N form in their retention. More than 95% of the total "1"5N applied was recovered after one growing season (~ 90% after two), demonstrating a considerable capacity of Arctic tundra to retain N from these deposition events. Important sinks for the deposited N, regardless of its application rate or form, were non-vascular plants > vascular plants > organic soil > litter > mineral soil, suggesting that non-vascular plants could be the primary component of this ecosystem to undergo measurable changes due to N enrichment from extreme deposition events. Substantial retention of N by soil microbial biomass (70% and 39% of "1"5N in organic and mineral horizon, respectively) during the initial partitioning demonstrated their capacity to act as effective buffers for N leaching. Between the two N forms, vascular plants (Salix polaris) in particular showed difference in their N recovery, incorporating four times greater "1"5NO_3"− than "1"5NH_4"+, suggesting deposition rich in nitrate will impact them more. Overall, these findings show that despite the deposition rates being extreme in statistical terms, biologically they do not exceed the capacity of tundra to sequester pollutant N during the growing season. Therefore, current and future extreme events may represent a major source of eutrophication. - Highlights: • High Arctic tundra demonstrated a
On-line tritium production and heat deposition rate measurements at the Lotus facility
International Nuclear Information System (INIS)
Joneja, O.P.; Scherrer, P.; Anand, R.P.
1994-01-01
Integral tritium production and heat deposition measurement in a prototype fusion blanket would enable verification of the computational codes and the data based employed for the calculations. A large number of tritium production rate measurements have been reported for different type of blankets, whereas the direct heat deposition due to the mixed radiation field in the fusion environment, is still in its infancy. In order to ascertain the kerma factors and the photon production libraries, suitable techniques must be developed to directly measure the nuclear heat deposition rates in the materials required for the fusion systems. In this context, at the Lotus facility, we have developed an extremely efficient double ionizing chamber, for the on-line tritium production measurements and employed a pure graphite calorimeter to measure the nuclear heat deposition due to the mixed radiation field of the 14 MeV, Haefely neutron generator. This paper presents both systems and some of the recent measurements. (authors). 8 refs., 13 figs
Wu, Mao-Sung; Wang, Min-Jyle
2010-10-07
Nickel oxide film with open macropores prepared by anodic deposition in the presence of surfactant shows a very high capacitance of 1110 F g(-1) at a scan rate of 10 mV s(-1), and the capacitance value reduces to 950 F g(-1) at a high scan rate of 200 mV s(-1).
Perspective: Highly stable vapor-deposited glasses
Ediger, M. D.
2017-12-01
This article describes recent progress in understanding highly stable glasses prepared by physical vapor deposition and provides perspective on further research directions for the field. For a given molecule, vapor-deposited glasses can have higher density and lower enthalpy than any glass that can be prepared by the more traditional route of cooling a liquid, and such glasses also exhibit greatly enhanced kinetic stability. Because vapor-deposited glasses can approach the bottom of the amorphous part of the potential energy landscape, they provide insights into the properties expected for the "ideal glass." Connections between vapor-deposited glasses, liquid-cooled glasses, and deeply supercooled liquids are explored. The generality of stable glass formation for organic molecules is discussed along with the prospects for stable glasses of other types of materials.
Determinants Factors of Interest Rates on Three-Month Deposits of Bank Persero
Directory of Open Access Journals (Sweden)
Tedy Kurniawan
2017-03-01
Full Text Available This research aims at analyzing the influence of Capital Adequacy Ratio (CAR, Operating Expenses of Operating Income (BOPO, inflation, exchange rate, and the amount of money supply (M1 to the interest rate of three month deposits of the State-Owned Bank in Indonesia in 2007-2015. This research uses the error correction model analysis. The result obtained is the CAR that has a significant effect on the long term and has no effect on the short term, BOPO has a significant influence on the long term and short term, inflation has the significant effect on the long term and has no effect on the short term, the exchange rate has an influence on the short and long term, the money supply has no effects on the short and long-term on the interest rate on three month deposits of the State-Owned Bank.
International Nuclear Information System (INIS)
Turnage, K.M.; Lee, S.Y.; Foss, J.E.; Kim, K.H.; Larsen, I.L.
1997-01-01
Three dolines (sinkholes), each representing different land uses (crop, grass, and forest) in a karst area in East Tennesse, were selected to determine soil erosional and depositional rates. Three methods were used to estimate the rates: fallout radiocesium ( 137 Cs) redistribution, buried surface soil horizons (Ab horizon), and the revised universal soil loss equation (RUSLE). When 137 Cs redistribution was examined, the average soil erosion rates were calculated to be 27 t ha -1 yr -1 at the cropland, 3 t ha -1 yr -1 at the grassland, and 2 t ha -1 yr -1 at the forest. By comparison, cropland erosion rate of 2.6 t ha -1 yr -1 , a grassland rate of 0.6 t ha -1 yr -1 , and a forest rate of 0.2 t ha -1 yr -1 were estimated by RUSLE. The 137 Cs method expressed higher rates than RUSLE because RUSLE tends to overestimate low erosion rates and does not account for deposition. The buried surface horizons method resulted in deposition rates that were 8 t ha -1 yr -1 (during 480 yr) at the cropland, 12 t ha -1 yr -1 (during 980 yr) at the grassland, and 4 t ha -1 yr -1 (during 101 yr) at the forest site. By examining 137 Cs redistribution, soil deposition rates were found to be 23 t ha -1 yr -1 at the cropland, 20 t ha -1 yr -1 at the grassland, and 16 t ha -1 yr -1 at the forest site. The variability in deposition rates was accounted for by temporal differences; 137 Cs expressed deposition during the last 38 yr, whereas Ab horizons represented deposition during hundreds of years. In most cases, land used affected both erosion and deposition rates - the highest rates of soil redistribution usually representing the cropland and the lowest, the forest. When this was not true, differences in the rates were attributed to differences in the size, shape, and closure of the dolines. (orig.)
Measurement of the rate of droplet deposition in vertical upward and downward annular flows
International Nuclear Information System (INIS)
Murakami, Toshihiro; Okawa, Tomio; Takei, Rei
2008-01-01
The deposition rate of droplets was measured for vertical annular two-phase flows in a small diameter tube by means of the double film extraction technique. The test section was a round tube of 5 mm in inside diameter, air and water were used as test fluids, and the flow direction was set to upward and downward; the system pressure and the flow rates of gas and liquid phases were changed parametrically. If the droplet velocity relative to the continuous gas phase is in the equilibrium state, the shear induced lift force acting on droplets is directed toward the tube centerline in upflow while toward the tube wall in downflow. Particular attention was therefore paid to the effect of flow direction. It was shown experimentally that the deposition rate of droplets in downward flow is greater than that in upward flow. The difference in the measured deposition rate may be attributed to the direction of lift force acting on droplets. (author)
Characterisation of DLC films deposited using titanium isopropoxide (TIPOT) at different flow rates.
Said, R; Ali, N; Ghumman, C A A; Teodoro, O M N D; Ahmed, W
2009-07-01
In recent years, there has been growing interest in the search for advanced biomaterials for biomedical applications, such as human implants and surgical cutting tools. It is known that both carbon and titanium exhibit good biocompatibility and have been used as implants in the human body. It is highly desirable to deposit biocompatible thin films onto a range of components in order to impart biocompatibility and to minimise wear in implants. Diamond like carbon (DLC) is a good candidate material for achieving biocompatibility and low wear rates. In this study, thin films of diamond-like-carbon DLC were deposited onto stainless steel (316) substrates using C2H2, argon and titanium isopropoxide (TIPOT) precursors. Argon was used to generate the plasma in the plasma enhanced vapour deposition (PECVD) system. A critical coating feature governing the performance of the component during service is film thickness. The as-grown films were in the thickness range 90-100 nm and were found to be dependent on TIPOT flow rate. Atomic force microscopy (AFM) was used to characterise the surface roughness of the samples. As the flow rate of TIPOT increased the average roughness was found to increase in conjunction with the film thickness. Raman spectroscopy was used to investigate the chemical structure of amorphous carbon matrix. Surface tension values were calculated using contact angle measurements. In general, the trend of the surface tension results exhibited an opposite trend to that of the contact angle. The elemental composition of the samples was characterised using a VG ToF SIMS (IX23LS) instrument and X-ray photoelectron spectroscopy (XPS). Surprisingly, SIMS and XPS results showed that the DLC samples did not show evidence of titanium since no peaks representing to titanium appeared on the SIMS/XPS spectra.
The Pulsed Cylindrical Magnetron for Deposition
Korenev, Sergey
2012-10-01
The magnetron sputtering deposition of films and coatings broadly uses in microelectronics, material science, environmental applications and etc. The rate of target evaporation and time for deposition of films and coatings depends on magnetic field. These parameters link with efficiency of gas molecules ionization by electrons. The cylindrical magnetrons use for deposition of films and coatings on inside of pipes for different protective films and coatings in oil, chemical, environmental applications. The classical forming of magnetic field by permanent magnets or coils for big and long cylindrical magnetrons is complicated. The new concept of pulsed cylindrical magnetron for high rate deposition of films and coating for big and long pipes is presented in this paper. The proposed cylindrical magnetron has azimuthally pulsed high magnetic field, which allows forming the high ionized plasma and receiving high rate of evaporation material of target (central electrode). The structure of proposed pulsed cylindrical magnetron sputtering system is given. The main requirements to deposition system are presented. The preliminary data for forming of plasma and deposition of Ta films and coatings on the metal pipers are discussed. The comparison of classical and proposed cylindrical magnetrons is given. The analysis of potential applications is considered.
International Nuclear Information System (INIS)
Lee, Seung Moo; Won, Jaihyung; Yim, Soyoung; Park, Se Jun; Choi, Jongsik; Kim, Jeongtae; Lee, Hyeondeok; Byun, Dongjin
2012-01-01
thermal annealing of the high density, as-deposited a-C:H films. Furthermore, not only the density itself but also the variation of density with thermal annealing need to be elucidated in order to understand the dry etch properties of annealed a-C:H films. - Highlights: ► A-C:H(amorphous carbon) films are grown for using hard mask in dry etch process by plasma-enhanced chemical vapor deposition and annealed. ► Physical, chemical and mechanical properties of grown amorphous carbon films are changed by hydrogen and hydrocarbon contents, be determined by deposition and annealing temperature. ► Dry etch rate of a-C:H films is decreased and the film density increased through thermal annealing with high density, low hydrogen content, as-deposited film.
Probe Measurements of Ash Deposit Formation Rate and Shedding in a Biomass Suspension-Fired boiler
DEFF Research Database (Denmark)
Shafique Bashir, Muhammad; Jensen, Peter Arendt; Frandsen, Flemming
The aim of this study was to investigate ash deposit formation rate, heat uptake reduction and deposit removal by using advanced online ash deposition and sootblowing probes in a 350 MWth suspension-fired boiler, utilizing wood and straw pellets as fuel. The influence of fuel type (straw share...
International Nuclear Information System (INIS)
Osaki, S.; Sugihara, S.; Maeda, Y.; Osaki, T.
2007-01-01
The dry deposition rates on various grass fields and two forests have been measured by the use of 212 Pb (T 1/2 = 10.6 hours). The deposition rate on grass fields (average: 7 mm x s -1 ) roughly depends on the logarithms of the heights or densities of the grasses. The dry deposition rates on a broadleaved forest (Lithocarpus edulis) and a coniferous forest (Cryptomeria Japonica) were also measured. The highest (ave. 26 mm x s -1 ) was on the forest of C. Japonica because of the dense and adhesive surfaces of the leaves. (author)
International Nuclear Information System (INIS)
Akhtar, P.; Abbas, M.
2007-01-01
Titanium nitride (TiN) widely used as hard coating material, was coated on tool steels, namely on high-speed steel (HSS) and D2 tool steel by physical vapour deposition method. The study concentrated on cathodic arc physical vapour deposition (CAPVD), a technique used for the deposition of hard coatings for tooling applications, and which has many advantages. The main drawback of this technique, however, is the formation of macrodroplets (MD's) during deposition, resulting in films with rougher morphology. Various standard characterization techniques and equipment, such as electron microscopy, atomic force microscopy, hardness testing machine, scratch tester and pin-on-disc machine, were used to analyze and quantify the following properties and parameters, surface morphology, thickness, hardness, adhesion and coefficient of friction (COF) of the deposited coatings. Surface morphology revealed that the MD's produced during the etching stage, protruded through the thin film, resulting in film with deteriorated surface features. Both coating thickness and indentation loads influenced the hardness of the deposited coatings. The coatings deposited on HSS exhibit better adhesion compared to those on D2 tool steel. Standard deviation indicates that the coating deposited with thickness around 6.7 macro m showed the most stable trend of COF versus sliding distance. (author)
Arnott, Shelley E; Dillon, Peter J; Somers, Keith; Keller, Bill
2003-01-01
Quantifying chemical variability in different lake types is important for the assessment of both chemical and biological responses to environmental change. For monitoring programs that emphasize a large number of lakes at the expense of frequent samples, high variability may influence how representative single samples are of the average conditions of individual lakes. Intensive temporal data from long-term research sites provide a unique opportunity to assess chemical variability in lakes with different characteristics. We compared the intra- and inter-annual variability of four acidification related variables (Gran alkalinity, pH, sulphate concentration, and total base cation concentration) in four lakes with different flushing rates and acid deposition histories. Variability was highest in lakes with high flushing rates and was not influenced by historic acid deposition in our study lakes. This has implications for the amount of effort required in monitoring programs. Lakes with high flushing rates will require more frequent sampling intervals than lakes with low flushing rates. Consideration of specific lake types should be included in the design of monitoring programs.
Solid State Track Recorder fission rate measurements at high neutron fluence and high temperature
International Nuclear Information System (INIS)
Ruddy, F.H.; Roberts, J.H.; Gold, R.
1985-01-01
Solid State Track Recorder (SSTR) techniques have been used to measure 239-Pu, 235-U, and 237-Np fission rates for total neutron fluences approaching 5 x 10 17 n/cm 2 at temperatures in the range 680 to 830 0 F. Natural quartz crystal SSTRs were used to withstand the high temperature environment and ultra low-mass fissionable deposits of the three isotopes were required to yield scannable track densities at the high neutron fluences. The results of these high temperature, high neutron fluence measurements are reported
Energy Technology Data Exchange (ETDEWEB)
Choudhary, Sonal, E-mail: S.Choudhary@sheffield.ac.uk [Department of Animal and Plant Sciences, University of Sheffield, Western Bank, Sheffield S10 2TN (United Kingdom); Management School, University of Sheffield, Conduit Road, Sheffield S10 1FL (United Kingdom); Blaud, Aimeric [Department of Animal and Plant Sciences, University of Sheffield, Western Bank, Sheffield S10 2TN (United Kingdom); Osborn, A. Mark [Department of Animal and Plant Sciences, University of Sheffield, Western Bank, Sheffield S10 2TN (United Kingdom); School of Applied Sciences, RMIT University, PO Box 71, Bundoora, VIC 3083 (Australia); Press, Malcolm C. [School of Biosciences, University of Birmingham, Edgbaston, Birmingham B15 2TT (United Kingdom); Manchester Metropolitan University, Manchester, M15 6BH (United Kingdom); Phoenix, Gareth K. [Department of Animal and Plant Sciences, University of Sheffield, Western Bank, Sheffield S10 2TN (United Kingdom)
2016-06-01
Arctic ecosystems are threatened by pollution from recently detected extreme atmospheric nitrogen (N) deposition events in which up to 90% of the annual N deposition can occur in just a few days. We undertook the first assessment of the fate of N from extreme deposition in High Arctic tundra and are presenting the results from the whole ecosystem {sup 15}N labelling experiment. In 2010, we simulated N depositions at rates of 0, 0.04, 0.4 and 1.2 g N m{sup −2} yr{sup −1}, applied as {sup 15}NH{sub 4}{sup 15}NO{sub 3} in Svalbard (79{sup °}N), during the summer. Separate applications of {sup 15}NO{sub 3}{sup −} and {sup 15}NH{sub 4}{sup +} were also made to determine the importance of N form in their retention. More than 95% of the total {sup 15}N applied was recovered after one growing season (~ 90% after two), demonstrating a considerable capacity of Arctic tundra to retain N from these deposition events. Important sinks for the deposited N, regardless of its application rate or form, were non-vascular plants > vascular plants > organic soil > litter > mineral soil, suggesting that non-vascular plants could be the primary component of this ecosystem to undergo measurable changes due to N enrichment from extreme deposition events. Substantial retention of N by soil microbial biomass (70% and 39% of {sup 15}N in organic and mineral horizon, respectively) during the initial partitioning demonstrated their capacity to act as effective buffers for N leaching. Between the two N forms, vascular plants (Salix polaris) in particular showed difference in their N recovery, incorporating four times greater {sup 15}NO{sub 3}{sup −} than {sup 15}NH{sub 4}{sup +}, suggesting deposition rich in nitrate will impact them more. Overall, these findings show that despite the deposition rates being extreme in statistical terms, biologically they do not exceed the capacity of tundra to sequester pollutant N during the growing season. Therefore, current and future extreme events
Energy Technology Data Exchange (ETDEWEB)
Siegal, M.P.; Dawley, J.T.; Clem, P.G.; Overmyer, D.L
2003-12-01
The superconducting and structural properties of YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} (YBCO) films grown from chemical solution deposited (CSD) metallofluoride-based precursors improve by using high heating rates to the desired growth temperature. This is due to avoiding the nucleation of undesirable a-axis grains at lower temperatures, from 650 to 800 deg. C in p(O{sub 2})=0.1%. Minimizing time spent in this range during the temperature ramp of the ex situ growth process depresses a-axis grain growth in favor of the desired c-axis orientation. Using optimized conditions, this results in high-quality YBCO films on LaAlO{sub 3}(1 0 0) with J{sub c}(77 K) {approx} 3 MA/cm{sup 2} for films thicknesses ranging from 60 to 140 nm. In particular, there is a dramatic decrease in a-axis grains in coated-conductors grown on CSD Nb-doped SrTiO{sub 3}(1 0 0) buffered Ni(1 0 0) tapes.
Reducing tube bundle deposition with alternative amines
International Nuclear Information System (INIS)
Turner, C.W.; Klimas, S.J.; Frattini, P.L.
1998-01-01
Particle deposition rates have been measured in a high-temperature loop for magnetite and hematite depositing onto Inconel-600 under flow-boiling conditions with pH controlled using one of the following amines: morpholine, ammonia, ethanolamine, or dimethylamine. Hematite particles deposited at rates an order of magnitude greater than those measured for magnetite, although the hematite deposition rate dropped when the loop was operated under reducing conditions. The magnetite deposition rate was influenced by the amine used to control the pH, with the relative rate decreasing in the following series: morpholine (1) : ethanolamine (0.72) ammonia (0.51) : dimethylamine (0.25). These trends in deposition rate are discussed in terms of the surface chemistry of the corrosion products. Deposition rates for both magnetite and hematite increased significantly once the mixture quality exceeded about 0.3, which may be related to a change in the heat transfer mechanism from nucleate boiling to two-phase forced convection through a thin film. (author)
Reducing tube bundle deposition using alternative amines
International Nuclear Information System (INIS)
Turner, C.W.; Klimas, S.J.; Frattini, P.L.
1999-07-01
Particle deposition rates were measured in a high-temperature loop for magnetite and hematite depositing onto Inconel-600 under flow-boiling conditions with pH controlled, using one of the following amines: morpholine, ammonia, ethanolamine, or dimethylamine. Hematite particles deposited at rates 10 times greater than those measured for magnetite although the hematite deposition rate dropped when the loop was operated under reducing conditions. The magnetite deposition rate was influenced by the amine used to control the pH, with the relative rate decreasing in the following series: morpholine (1) : ethanolamine (0.72) : ammonia (0.51) dimethylamine (0.25). These trends in deposition rate are discussed in terms of the surface chemistry of the corrosion products. Deposition rates for both magnetite and hematite increased significantly once the mixture quality exceeded about 0.3, which may be related to a change in the heat-transfer mechanism from nucleate boiling to 2-phase forced-convection through a thin film. (author)
Mlynczak, Martin G.; Garcia, Rolando R.; Roble, Raymond G.; Hagan, Maura
2000-01-01
We derive rates of energy deposition in the mesosphere due to the absorption of solar ultraviolet radiation by ozone. The rates are derived directly from measurements of the 1.27-microns oxygen dayglow emission, independent of knowledge of the ozone abundance, the ozone absorption cross sections, and the ultraviolet solar irradiance in the ozone Hartley band. Fifty-six months of airglow data taken between 1982 and 1986 by the near-infrared spectrometer on the Solar-Mesosphere Explorer satellite are analyzed. The energy deposition rates exhibit altitude-dependent annual and semi-annual variations. We also find a positive correlation between temperatures and energy deposition rates near 90 km at low latitudes. This correlation is largely due to the semiannual oscillation in temperature and ozone and is consistent with model calculations. There is also a suggestion of possible tidal enhancement of this correlation based on recent theoretical and observational analyses. The airglow-derived rates of energy deposition are then compared with those computed by multidimensional numerical models. The observed and modeled deposition rates typically agree to within 20%. This agreement in energy deposition rates implies the same agreement exists between measured and modeled ozone volume mixing ratios in the mesosphere. Only in the upper mesosphere at midlatitudes during winter do we derive energy deposition rates (and hence ozone mixing ratios) consistently and significantly larger than the model calculations. This result is contrary to previous studies that have shown a large model deficit in the ozone abundance throughout the mesosphere. The climatology of solar energy deposition and heating presented in this paper is available to the community at the Middle Atmosphere Energy Budget Project web site at http://heat-budget.gats-inc.com.
International Nuclear Information System (INIS)
Ramdan, R.D.; Jauhari, I.; Hasan, R.; Masdek, N.R. Nik
2008-01-01
This paper describes an implementation of superplastic deformation method for the deposition of carbonated-apatite (CAP) on the well-know titanium alloy, Ti6Al4V. This deposition process was carried out using high-temperature compression test machine, at temperature of 775 deg. C, different strain rates, and conducted along the elastic region of the sample. Before the process, titanium substrate was cryogenically treated in order to approach superplastic characteristic during the process. After the process, thin film of CAP was created on the substrate with the thickness from 0.71 μm to 1.42 μm. The resulted film has a high density of CAP that covered completely the surface of the substrate. From the stress-strain relation chart, it can be observed that as the strain rate decreases, the area under stress-strain chart also decreases. This condition influences the density of CAP layer on the substrate that as this area decreases, the density of CAP layer also decreases as also confirmed by X-ray diffraction characterization. In addition, since the resulting layer of CAP is in the form of thin film, this layer did not alter the hardness of the substrate as measured by Vickers hardness test method. On the other hand, the resulting films also show a good bonding strength properties as the layer remain exist after friction test against polishing clothes for 1 h
Energy Technology Data Exchange (ETDEWEB)
Bavand, R.; Yelon, A.; Sacher, E., E-mail: edward.sacher@polymtl.ca
2015-11-15
Highlights: • Ru nanoparticle 3d, 3p, and 3s core XPS spectra were found to be composed of three symmetric components. The first component, Ru1, is due to zerovalent R, while components Ru2 and Ru3 are attributed to surface oxide species. • The nanoparticle surface additionally possesses a carbon-rich surface, from residual gas hydrocarbons present in the vacuum. • TEM photomicrographs show the aggregation and partial coalescence of nanoparticles deposited at high deposition rates, provoked by the high rate of release of the heat of condensation, indicating weak bonding to the HOPG substrate. • The analysis of the valence band indicates an increase of the Kubo gap with decreasing NP size, accompanied by an abrupt electron spill-over from the 4d to the 5s orbital. - Abstract: Ruthenium nanoparticles (Ru NPs) function as effective catalysts in specific reactions, such as methanation and Fischer-Tropsch syntheses. It is our purpose to physicochemically characterize their surfaces, at which catalysis occurs, by surface-sensitive X-ray photoelectron spectroscopy (XPS), using the symmetric peak component anaylsis technique developed in our laboratory to reveal previously hidden components. Ru NPs were deposited by evaporation (0.25–1.5 nm nominal deposition range) onto highly oriented pyrolytic graphite (HOPG). In addition to their surfaces being characterized by XPS, an indication of morphology was obtained from transmission electron microscopy (TEM). Our use of symmetric peak component XPS analysis has revealed detailed information on a previously unidentified surface oxide initially formed, as well as on the valence electronic structure and its variation with NP size, information that is of potential importance in the use of these NPs in catalysis. Each of the several Ru core XPS spectra characterized (3d, 3p and 3s) was found to be composed of three symmetric components. Together with two metal oxide O1s components, these give evidence of a rather complex
Estimating the erosion and deposition rates in a small watershed by the 137Cs tracing method
International Nuclear Information System (INIS)
Li Mian; Li Zhanbin; Yao Wenyi; Liu Puling
2009-01-01
Understanding the erosion and deposition rates in a small watershed is important for designing soil and water conservation measures. The objective of this study is to estimate the net soil loss and gain at points with various land use types and landform positions in a small watershed in the Sichuan Hilly Basin of China by the 137 Cs tracing technique. Among various land use types, the order of erosion rate was bare rock > sloping cultivated land > forest land. The paddy field and Caotu (a kind of cultivated land located at the foot of hills) were depositional areas. The erosion rate under different landform was in this order: hillside > saddle > hilltop. The footslope and the valley were depositional areas. The 137 Cs technique was shown to provide an effective means of documenting the spatial distribution of soil erosion and deposition within the small watershed
Directory of Open Access Journals (Sweden)
Dittmann Iwona
2016-12-01
Full Text Available This paper presents the results of a comparison of the rates of return on specific open-end debt investment funds in Poland with the rates of return on bank deposits, in light of different time horizons. A comparative analysis was conducted based on the quartiles of the empirical distributions of the rates of return on selected funds and bank deposits. The empirical distributions were obtained using a moving window of observation. The results were largely influenced by very high interest rates on bank deposits in Poland in the years 1995–2001 (in the case of the oldest funds, and by the boom in the bond market in the years 2011–2012 (for the youngest funds. The investment horizon turned out to be significant. The best and worst funds were identified.
High throughput semiconductor deposition system
Young, David L.; Ptak, Aaron Joseph; Kuech, Thomas F.; Schulte, Kevin; Simon, John D.
2017-11-21
A reactor for growing or depositing semiconductor films or devices. The reactor may be designed for inline production of III-V materials grown by hydride vapor phase epitaxy (HVPE). The operating principles of the HVPE reactor can be used to provide a completely or partially inline reactor for many different materials. An exemplary design of the reactor is shown in the attached drawings. In some instances, all or many of the pieces of the reactor formed of quartz, such as welded quartz tubing, while other reactors are made from metal with appropriate corrosion resistant coatings such as quartz or other materials, e.g., corrosion resistant material, or stainless steel tubing or pipes may be used with a corrosion resistant material useful with HVPE-type reactants and gases. Using HVPE in the reactor allows use of lower-cost precursors at higher deposition rates such as in the range of 1 to 5 .mu.m/minute.
Thermal plasma chemical vapor deposition
International Nuclear Information System (INIS)
Heberlein, J.; Pfender, E.
1993-01-01
Thermal plasmas, with temperatures up to and even exceeding 10 4 K, are capable of producing high density vapor phase precursors for the deposition of relatively thick films. Although this technology is still in its infancy, it will fill the void between the relatively slow deposition processes such as physical vapor deposition and the high rate thermal spray deposition processes. In this chapter, the present state-of-the-art of this field is reviewed with emphasis on the various types of reactors proposed for this emerging technology. Only applications which attracted particular attention, namely diamond and high T c superconducting film deposition, are discussed in greater detail. (orig.)
Graphene hydrogels deposited in nickel foams for high-rate electrochemical capacitors.
Chen, Ji; Sheng, Kaixuan; Luo, Peihui; Li, Chun; Shi, Gaoquan
2012-08-28
Graphene hydrogel/nickel foam composite electrodes for high-rate electrochemical capacitors are produced by reduction of an aqueous dispersion of graphene oxide in a nickel foam (upper half of figure). The micropores of the hydrogel are exposed to the electrolyte so that ions can enter and form electrochemical double-layers. The nickel framework shortens the distances of charge transfer. Therefore, the electrochemical capacitor exhibits highrate performance (see plots). Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Energy Technology Data Exchange (ETDEWEB)
Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom)
2015-05-01
Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films.
International Nuclear Information System (INIS)
Lisco, F.; Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G.; Losurdo, M.; Walls, J.M.
2015-01-01
Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films
In-line high-rate evaporation of aluminum for the metallization of silicon solar cells
Energy Technology Data Exchange (ETDEWEB)
Mader, Christoph Paul
2012-07-11
This work focuses on the in-line high-rate evaporation of aluminum for contacting rear sides of silicon solar cells. The substrate temperature during the deposition process, the wafer bow after deposition, and the electrical properties of evaporated contacts are investigated. Furthermore, this work demonstrates for the first time the formation of aluminum-doped silicon regions by the in-line high-rate evaporation of aluminum without any further temperature treatment. The temperature of silicon wafers during in-line high-rate evaporation of aluminum is investigated in this work. The temperatures are found to depend on the wafer thickness W, the aluminum layer thickness d, and on the wafer emissivity {epsilon}. Two-dimensional finite-element simulations reproduce the measured peak temperatures with an accuracy of 97%. This work also investigates the wafer bow after in-line high-rate evaporation and shows that the elastic theory overestimates the wafer bow of planar Si wafers. The lower bow is explained with plastic deformation in the Al layer. Due to the plastic deformation only the first 79 K in temperature decrease result in a bow formation. Furthermore the electrical properties of evaporated point contacts are examined in this work. Parameterizations for the measured saturation currents of contacted p-type Si wafers and of contacted boron-diffused p{sup +}-type layers are presented. The contact resistivity of the deposited Al layers to silicon for various deposition processes and silicon surface concentrations are presented and the activation energy of the contact formation is determined. The measured saturation current densities and contact resistivities of the evaporated contacts are used in one-dimensional numerical Simulations and the impact on energy conversion efficiency of replacing a screen-printed rear side by an evaporated rear side is presented. For the first time the formation of aluminum-doped p{sup +}-type (Al-p{sup +}) silicon regions by the in
High performance emitter for thermionic diode obtained by chemical vapor deposition
International Nuclear Information System (INIS)
Faron, R.; Bargues, M.; Durand, J.P.; Gillardeau, J.
1973-01-01
Vapor deposition process conditions presently known for tungsten and molybdenum (specifically the range of high temperatures and low pressures) permit the achievement of high performance thermionic emitters when used with an appropriate technology. One example of this uses the following series of successive vapor deposits, the five last vapor deposits constituting the fabrication of the emitting layer: Mo deposit for the formation of the nuclear fuel mechanical support; Mo deposit, which constitutes the sheath of the nuclear fuel; epitaxed Mo--W alloy deposit; epitaxed tungsten deposit; fine-grained tungsten deposit; and tungsten deposit with surface orientation according to plane (110)W. In accordance with vapor deposition techniques previously developed, such a sequence of deposits can easily be achieved with the same equipment, even without having to take out the part during the course of the process. (U.S.)
Electrode patterning of ITO thin films by high repetition rate fiber laser
International Nuclear Information System (INIS)
Lin, H.K.; Hsu, W.C.
2014-01-01
Indium tin oxide (ITO) thin films are deposited on glass substrates using a radio frequency magnetron sputtering system. As-deposited ITO thin film was 100 nm in thickness and a transmittance of ITO film on glass substrate was 79% at 550 nm. Conductive electrodes are then patterned on the ITO films using a high repetition rate fiber laser system followed by a wet chemical etching process. The electrical, optical and structural properties of the patterned samples are evaluated by means of a four-point probe technique, spectrophotometer, X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results show that the samples annealed with a pulse repetition rate of 150 kHz or 400 kHz have a low sheet resistivity of 21 Ω/□ and a high optical transmittance of 90%. In addition, it is shown that a higher pulse repetition rate reduces both the residual stress and the surface roughness of the patterned specimens. Therefore, the present results suggest that a pulse repetition rate of 400 kHz represents the optimal processing condition for the patterning of crack-free ITO-coated glass substrates with good electrical and optical properties.
Electrode patterning of ITO thin films by high repetition rate fiber laser
Energy Technology Data Exchange (ETDEWEB)
Lin, H.K., E-mail: HKLin@mail.npust.edu.tw; Hsu, W.C.
2014-07-01
Indium tin oxide (ITO) thin films are deposited on glass substrates using a radio frequency magnetron sputtering system. As-deposited ITO thin film was 100 nm in thickness and a transmittance of ITO film on glass substrate was 79% at 550 nm. Conductive electrodes are then patterned on the ITO films using a high repetition rate fiber laser system followed by a wet chemical etching process. The electrical, optical and structural properties of the patterned samples are evaluated by means of a four-point probe technique, spectrophotometer, X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results show that the samples annealed with a pulse repetition rate of 150 kHz or 400 kHz have a low sheet resistivity of 21 Ω/□ and a high optical transmittance of 90%. In addition, it is shown that a higher pulse repetition rate reduces both the residual stress and the surface roughness of the patterned specimens. Therefore, the present results suggest that a pulse repetition rate of 400 kHz represents the optimal processing condition for the patterning of crack-free ITO-coated glass substrates with good electrical and optical properties.
Multilayer Porous Crucibles for the High Throughput Salt Separation from Uranium Deposits
International Nuclear Information System (INIS)
Kwon, S. W.; Park, K. M.; Kim, J. G.; Kim, I. T.; Seo, B. K.; Moon, J. G.
2013-01-01
Solid cathode processing is necessary to separate the salt from the cathode since the uranium deposit in a solid cathode contains electrolyte salt. A physical separation process, such as a distillation separation, is more attractive than a chemical or dissolution process because physical processes generate much less secondary process. Distillation process was employed for the cathode processsing due to the advantages of minimal generation of secondary waste, compact unit process, simple and low cost equipment. The basis for vacuum distillation separation is the difference in vapor pressures between salt and uranium. A solid cathode deposit is heated in a heating region and salt vaporizes, while nonvolatile uranium remains behind. It is very important to increase the throughput of the salt separation system owing to the high uranium content of spent nuclear fuel and high salt fraction of uranium dendrites. The evaporation rate of the LiCl-KCl eutectic salt in vacuum distiller is not so high to come up with the generation capacity of uranium dendrites in an electro-refiner. Therefore, a wide evaporation area or high distillation temperature is necessary for the successful salt separation. In this study, it was attempted to enlarge a throughput of the salt distiller with a multilayer porous crucibles for the separation of adhered salt in the uranium deposits generated from the electrorefiner. The feasibility of the porous crucibles was tested by the salt distillation experiments. In this study, the salt distiller with multilayer porous crucibles was proposed and the feasibility of liquid salt separation was examined to increase a throughput. It was found that the effective separation of salt from uranium deposits was possible by the multilayer porous crucibles
Multilayer Porous Crucibles for the High Throughput Salt Separation from Uranium Deposits
Energy Technology Data Exchange (ETDEWEB)
Kwon, S. W.; Park, K. M.; Kim, J. G.; Kim, I. T.; Seo, B. K.; Moon, J. G. [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)
2013-05-15
Solid cathode processing is necessary to separate the salt from the cathode since the uranium deposit in a solid cathode contains electrolyte salt. A physical separation process, such as a distillation separation, is more attractive than a chemical or dissolution process because physical processes generate much less secondary process. Distillation process was employed for the cathode processsing due to the advantages of minimal generation of secondary waste, compact unit process, simple and low cost equipment. The basis for vacuum distillation separation is the difference in vapor pressures between salt and uranium. A solid cathode deposit is heated in a heating region and salt vaporizes, while nonvolatile uranium remains behind. It is very important to increase the throughput of the salt separation system owing to the high uranium content of spent nuclear fuel and high salt fraction of uranium dendrites. The evaporation rate of the LiCl-KCl eutectic salt in vacuum distiller is not so high to come up with the generation capacity of uranium dendrites in an electro-refiner. Therefore, a wide evaporation area or high distillation temperature is necessary for the successful salt separation. In this study, it was attempted to enlarge a throughput of the salt distiller with a multilayer porous crucibles for the separation of adhered salt in the uranium deposits generated from the electrorefiner. The feasibility of the porous crucibles was tested by the salt distillation experiments. In this study, the salt distiller with multilayer porous crucibles was proposed and the feasibility of liquid salt separation was examined to increase a throughput. It was found that the effective separation of salt from uranium deposits was possible by the multilayer porous crucibles.
High Concentration of Zinc in Sub-retinal Pigment Epithelial Deposits
Energy Technology Data Exchange (ETDEWEB)
Lengyel,I.; Flinn, J.; Peto, T.; Linkous, D.; Cano, K.; Bird, A.; Lanzirotti, A.; Frederickson, C.; van Kuijk, F.
2007-01-01
One of the hallmarks of age-related macular degeneration (AMD), the leading cause of blindness in the elderly in Western societies, is the accumulation of sub-retinal pigment epithelial deposits (sub-RPE deposits), including drusen and basal laminar deposits, in Bruch's membrane (BM). The nature and the underlying mechanisms of this deposit formation are not fully understood. Because we know that zinc contributes to deposit formation in neurodegenerative diseases, we tested the hypothesis that zinc might be involved in deposit formation in AMD. Using zinc specific fluorescent probes and microprobe synchrotron X-ray fluorescence we showed that sub-RPE deposits in post-mortem human tissues contain unexpectedly high concentrations of zinc, including abundant bio-available (ionic and/or loosely protein bound) ions. Zinc accumulation was especially high in the maculae of eyes with AMD. Internal deposit structures are especially enriched in bio-available zinc. Based on the evidence provided here we suggest that zinc plays a role in sub-RPE deposit formation in the aging human eye and possibly also in the development and/or progression of AMD.
High Concentration of Zinc in Sub-retinal Pigment Epithelial Deposits
International Nuclear Information System (INIS)
Lengyel, I.; Flinn, J.; Peto, T.; Linkous, D.; Cano, K.; Bird, A.; Lanzirotti, A.; Frederickson, C.; van Kuijk, F.
2007-01-01
One of the hallmarks of age-related macular degeneration (AMD), the leading cause of blindness in the elderly in Western societies, is the accumulation of sub-retinal pigment epithelial deposits (sub-RPE deposits), including drusen and basal laminar deposits, in Bruch's membrane (BM). The nature and the underlying mechanisms of this deposit formation are not fully understood. Because we know that zinc contributes to deposit formation in neurodegenerative diseases, we tested the hypothesis that zinc might be involved in deposit formation in AMD. Using zinc specific fluorescent probes and microprobe synchrotron X-ray fluorescence we showed that sub-RPE deposits in post-mortem human tissues contain unexpectedly high concentrations of zinc, including abundant bio-available (ionic and/or loosely protein bound) ions. Zinc accumulation was especially high in the maculae of eyes with AMD. Internal deposit structures are especially enriched in bio-available zinc. Based on the evidence provided here we suggest that zinc plays a role in sub-RPE deposit formation in the aging human eye and possibly also in the development and/or progression of AMD
Ji, Xiaoyu; Cheng, Hiu Yan; Grede, Alex J.; Molina, Alex; Talreja, Disha; Mohney, Suzanne E.; Giebink, Noel C.; Badding, John V.; Gopalan, Venkatraman
2018-04-01
Conformally coating textured, high surface area substrates with high quality semiconductors is challenging. Here, we show that a high pressure chemical vapor deposition process can be employed to conformally coat the individual fibers of several types of flexible fabrics (cotton, carbon, steel) with electronically or optoelectronically active materials. The high pressure (˜30 MPa) significantly increases the deposition rate at low temperatures. As a result, it becomes possible to deposit technologically important hydrogenated amorphous silicon (a-Si:H) from silane by a simple and very practical pyrolysis process without the use of plasma, photochemical, hot-wire, or other forms of activation. By confining gas phase reactions in microscale reactors, we show that the formation of undesired particles is inhibited within the microscale spaces between the individual wires in the fabric structures. Such a conformal coating approach enables the direct fabrication of hydrogenated amorphous silicon-based Schottky junction devices on a stainless steel fabric functioning as a solar fabric.
Highly Controlled Codeposition Rate of Organolead Halide Perovskite by Laser Evaporation Method.
Miyadera, Tetsuhiko; Sugita, Takeshi; Tampo, Hitoshi; Matsubara, Koji; Chikamatsu, Masayuki
2016-10-05
Organolead-halide perovskites can be promising materials for next-generation solar cells because of its high power conversion efficiency. The method of precise fabrication is required because both solution-process and vacuum-process fabrication of the perovskite have problems of controllability and reproducibility. Vacuum deposition process was expected to achieve precise control; however, vaporization of amine compound significantly degrades the controllability of deposition rate. Here we achieved the reduction of the vaporization by implementing the laser evaporation system for the codeposition of perovskite. Locally irradiated continuous-wave lasers on the source materials realized the reduced vaporization of CH 3 NH 3 I. The deposition rate was stabilized for several hours by adjusting the duty ratio of modulated laser based on proportional-integral control. Organic-photovoltaic-type perovskite solar cells were fabricated by codeposition of PbI 2 and CH 3 NH 3 I. A power-conversion efficiency of 16.0% with reduced hysteresis was achieved.
Lang, Joerg; Winsemann, Jutta
2015-04-01
Subaqueous ice-contact fans are deposited by high-energy plane-wall jets from subglacial conduits into standing water bodies. Highly aggradational conditions during flow expansion and deceleration allow for the preservation of bedforms related to supercritical flows, which are commonly considered rare in the depositional record. We present field examples from gravelly and sandy subaqueous ice-contact fan successions, which indicate that deposition by supercritical flows might be considered as a characteristic feature of these depositional systems. The studied successions were deposited in deep ice-dammed lakes, which formed along the margins of the Middle Pleistocene Scandinavian ice sheets across Northern Germany. The gravel-rich subaqueous fan deposits are dominated by large scour-fills (up to 25 m wide and 3 m) deep and deposits of turbulent hyperconcentrated flows, which are partly attributed to supercritical flow conditions (Winsemann et al., 2009). Scours (up to 4.5 m wide and 0.9 m deep) infilled by gravelly backsets are observed above laterally extensive erosional surfaces and are interpreted as deposits of cyclic steps. Laterally discontinuous beds of low-angle cross-stratified gravel are interpreted as antidune deposits. Downflow and up-section the gravel-rich deposits pass into sand-rich successions, which include deposits of chutes-and-pools, breaking antidunes, stationary antidunes and humpback dunes (Lang and Winsemann, 2013). Deposits of chutes-and-pools and breaking antidunes are characterised by scour-fills (up to 4 m wide and 1.2 m deep) comprising backsets or gently dipping sigmoidal foresets. Stationary antidune deposits consist of laterally extensive sinusoidal waveforms with long wavelengths (1-12 m) and low amplitudes (0.1-0.5 m), which formed under quasi-steady flows at the lower limit of the supercritical flow stage and high rates of sedimentation. Humpback dunes are characterised by divergent sigmoidal foresets and are interpreted as
Ding, Wanyu; Ju, Dongying; Chai, Weiping
2011-06-01
N doped Ti02 films were deposited by direct current pulse magnetron sputtering system at room temperature. The influence of 02 flow rate on the crystal structure of deposited films was studied by Stylus profilometer, X-ray photoelectron spectroscopy, and X-ray diffractometer. The results indicate that the 02 flow rate strongly controls the growth behavior and crystal structure of N doped Ti02 film. It is found that N element mainly exists as substitutional doped state and the chemical stiochiometry is near to TiO1.68±0.06N0.11±0.01 for all film samples. N doped Ti02 film deposited with 2 sccm (standard-state cubic centimeter per minute) 02 flow rate is amorphous structure with high growth rate, which contains both anatase phase and rutile phase crystal nucleuses. In this case, the film displays the mix-phase of anatase and rutile after annealing treatment. While N doped Ti02 film deposited with 12 cm(3)/min 02 flow rate displays anatase phase before and after annealing treatment. And it should be noticed that no TiN phase appears for all samples before and after annealing treatment. Copyright © 2011 The Research Centre for Eco-Environmental Sciences, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved.
International Nuclear Information System (INIS)
Joensson, M; Nerushev, O A; Campbell, E E B
2007-01-01
In situ laser reflectivity measurements are used to monitor the growth of multiwalled carbon nanotube (MWCNT) films grown by DC plasma-enhanced chemical vapour deposition (PECVD) from an iron catalyst film deposited on a silicon wafer. In contrast to thermal CVD growth, there is no initial increase in the growth rate; instead, the initial growth rate is high (as much as 10 μm min -1 ) and then drops off rapidly to reach a steady level (2 μm min -1 ) for times beyond 1 min. We show that a limiting factor for growing thick films of multiwalled nanotubes (MWNTs) using PECVD can be the formation of an amorphous carbon layer at the top of the growing nanotubes. In situ reflectivity measurements provide a convenient technique for detecting the onset of the growth of this layer
Harder, Bryan James; Zhu, Dongming; Schmitt, Michael P.; Wolfe, Douglas E.
2014-01-01
Si-based ceramic matrix composites (CMCs) require environmental barrier coatings (EBCs) in combustion environments to avoid rapid material loss. Candidate EBC materials have use temperatures only marginally above current technology, but the addition of a columnar oxide topcoat can substantially increase the durability. Plasma Spray-Physical Vapor Deposition (PS-PVD) allows application of these multilayer EBCs in a single process. The PS-PVD technique is a unique method that combines conventional thermal spray and vapor phase methods, allowing for tailoring of thin, dense layers or columnar microstructures by varying deposition conditions. Multilayer coatings were deposited on CMC specimens and assessed for durability under high heat flux and load. Coated samples with surface temperatures ranging from 2400-2700F and 10 ksi loads using the high heat flux laser rigs at NASA Glenn. Coating morphology was characterized in the as-sprayed condition and after thermomechanical loading using electron microscopy and the phase structure was tracked using X-ray diffraction.
Si nanostructures grown by picosecond high repetition rate pulsed laser deposition
International Nuclear Information System (INIS)
Pervolaraki, M.; Komninou, Ph.; Kioseoglou, J.; Athanasopoulos, G.I.; Giapintzakis, J.
2013-01-01
One-step growth of n-doped Si nanostructures by picosecond ultra fast pulsed laser deposition at 1064 nm is reported for the first time. The structure and morphology of the Si nanostructures were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy. Transmission electron microscopy studies revealed that the shape of the Si nanostructures depends on the ambient argon pressure. Fibrous networks, cauliflower formations and Si rectangular crystals grew when argon pressure of 300 Pa, 30 Pa and vacuum (10 −3 Pa) conditions were used, respectively. In addition, the electrical resistance of the vacuum made material was investigated
Si nanostructures grown by picosecond high repetition rate pulsed laser deposition
Energy Technology Data Exchange (ETDEWEB)
Pervolaraki, M., E-mail: pervolaraki@ucy.ac.cy [Nanotechnology Research Center and Department of Mechanical and Manufacturing Engineering, University of Cyprus, 75 Kallipoleos Av., PO Box 20537, 1678 Nicosia (Cyprus); Komninou, Ph.; Kioseoglou, J. [Department of Physics, Aristotle University of Thessaloniki, GR-54124 Thessaloniki (Greece); Athanasopoulos, G.I. [Nanotechnology Research Center and Department of Mechanical and Manufacturing Engineering, University of Cyprus, 75 Kallipoleos Av., PO Box 20537, 1678 Nicosia (Cyprus); Giapintzakis, J., E-mail: giapintz@ucy.ac.cy [Nanotechnology Research Center and Department of Mechanical and Manufacturing Engineering, University of Cyprus, 75 Kallipoleos Av., PO Box 20537, 1678 Nicosia (Cyprus)
2013-08-01
One-step growth of n-doped Si nanostructures by picosecond ultra fast pulsed laser deposition at 1064 nm is reported for the first time. The structure and morphology of the Si nanostructures were characterized by X-ray diffraction, scanning electron microscopy and atomic force microscopy. Transmission electron microscopy studies revealed that the shape of the Si nanostructures depends on the ambient argon pressure. Fibrous networks, cauliflower formations and Si rectangular crystals grew when argon pressure of 300 Pa, 30 Pa and vacuum (10{sup −3} Pa) conditions were used, respectively. In addition, the electrical resistance of the vacuum made material was investigated.
Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition
International Nuclear Information System (INIS)
Iliescu, Ciprian; Chen Bangtao; Wei Jiashen; Pang, A.J.
2008-01-01
The paper presents a characterisation of amorphous silicon carbide films deposited in plasma-enhanced chemical vapour deposition (PECVD) reactors for MEMS applications. The main parameter was optimised in order to achieve a low stress and high deposition rate. We noticed that the high frequency mode (13.56 MHz) gives a low stress value which can be tuned from tensile to compressive by selecting the correct power. The low frequency mode (380 kHz) generates high compressive stress (around 500 MPa) due to ion bombardment and, as a result, densification of the layer achieved. Temperature can decrease the compressive value of the stress (due to annealing effect). A low etching rate of the amorphous silicon carbide layer was noticed for wet etching in KOH 30% at 80 o C (around 13 A/min) while in HF 49% the layer is practically inert. A very slow etching rate of amorphous silicon carbide layer in XeF 2 -7 A/min- was observed. The paper presents an example of this application: PECVD-amorphous silicon carbide cantilevers fabricated using surface micromachining by dry-released technique in XeF 2
Bavand, R.; Yelon, A.; Sacher, E.
2015-11-01
Ruthenium nanoparticles (Ru NPs) function as effective catalysts in specific reactions, such as methanation and Fischer-Tropsch syntheses. It is our purpose to physicochemically characterize their surfaces, at which catalysis occurs, by surface-sensitive X-ray photoelectron spectroscopy (XPS), using the symmetric peak component anaylsis technique developed in our laboratory to reveal previously hidden components. Ru NPs were deposited by evaporation (0.25-1.5 nm nominal deposition range) onto highly oriented pyrolytic graphite (HOPG). In addition to their surfaces being characterized by XPS, an indication of morphology was obtained from transmission electron microscopy (TEM). Our use of symmetric peak component XPS analysis has revealed detailed information on a previously unidentified surface oxide initially formed, as well as on the valence electronic structure and its variation with NP size, information that is of potential importance in the use of these NPs in catalysis. Each of the several Ru core XPS spectra characterized (3d, 3p and 3s) was found to be composed of three symmetric components. Together with two metal oxide O1s components, these give evidence of a rather complex, previously unidentified oxide that is initially formed. The Ru valence band (4d and 5s) spectra clearly demonstrate a loss of metallicity, a simultaneous increase of the Kubo gap, and an abrupt transfer in valence electron density from the 4d to the 5s orbitals (known as electron spill-over), as the NP size decreases below 0.5 nm. TEM photomicrographs, as a function of deposition rate, show that, at a rate that gives insufficient time for the NP condensation energy to dissipate, the initially well-separated NPs are capable of diffusing laterally and aggregating. This indicates weak NP bonding to the HOPG substrate. Carbide is formed, at both high and low deposition rates, at Ru deposition thicknesses greater than 0.25 nm, its formation explained by Ru NPs reacting with residual
Estimating the erosion and deposition rates in a small watershed by the {sup 137}Cs tracing method
Energy Technology Data Exchange (ETDEWEB)
Li Mian [Yellow River Institute of Hydraulic Research, Key Laboratory of Sediment Research of Yellow River of Ministry of Water Resources, Zhengzhou, Henan 450003 (China)], E-mail: hnli-mian@163.com; Li Zhanbin [Xi' an University of Technology, Xi' an, Shaanxi 710048 (China); Institute of Soil and Water Conservation, Chinese Academy of Sciences and Ministry of Water Resources, Yangling, Shaanxi 712100 (China); Yao Wenyi [Yellow River Institute of Hydraulic Research, Key Laboratory of Sediment Research of Yellow River of Ministry of Water Resources, Zhengzhou, Henan 450003 (China); Liu Puling [Institute of Soil and Water Conservation, Chinese Academy of Sciences and Ministry of Water Resources, Yangling, Shaanxi 712100 (China)
2009-02-15
Understanding the erosion and deposition rates in a small watershed is important for designing soil and water conservation measures. The objective of this study is to estimate the net soil loss and gain at points with various land use types and landform positions in a small watershed in the Sichuan Hilly Basin of China by the {sup 137}Cs tracing technique. Among various land use types, the order of erosion rate was bare rock > sloping cultivated land > forest land. The paddy field and Caotu (a kind of cultivated land located at the foot of hills) were depositional areas. The erosion rate under different landform was in this order: hillside > saddle > hilltop. The footslope and the valley were depositional areas. The {sup 137}Cs technique was shown to provide an effective means of documenting the spatial distribution of soil erosion and deposition within the small watershed.
Energy Technology Data Exchange (ETDEWEB)
Li, Peng-Hui [School of Aeronautics, Northwestern Polytechnical University, Xi’an 710072 (China); Guo, Wei-Guo, E-mail: weiguo@nwpu.edu.cn [School of Aeronautics, Northwestern Polytechnical University, Xi’an 710072 (China); Huang, Wei-Dong [The State Key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi’an 710072 (China); Su, Yu [Department of Mechanics, School of Aerospace Engineering, Beijing Institute of Technology, Beijing 100081 (China); Lin, Xin [The State Key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi’an 710072 (China); Yuan, Kang-Bo [School of Aeronautics, Northwestern Polytechnical University, Xi’an 710072 (China)
2015-10-28
To understand and evaluate the thermomechanical property of Ti–6Al–4V alloy prepared by the 3D laser deposition technology, an uniaxial compression test was performed on cylindrical samples using an electronic universal testing machine and enhanced Hopkinson technique, over the range of strain rate from 0.001/s to 5000/s, and at initial temperatures from the room temperature to 1173 K. The microstructure of the undeformed and deformed samples was examined through optical microscopy and the use of scanning electron microscope (SEM). The experimental results show the followings: (1) the anisotropy of the mechanical property of this alloy is not significant despite the visible stratification at the exterior surfaces; (2) initial defects, such as the initial voids and lack of fusion, are found in the microstructure and in the crack surfaces of the deformed samples, and they are considered as a major source of crack initiation and propagation; (3) adiabatic shear bands and shearing can easily develop at all selected temperatures for samples under compression; (4) the yield and ultimate strengths of this laser-deposited Ti–6Al–4V alloy are both lower than those of the Ti–6Al–4V alloy prepared by forging and electron beam melting, whereas both of its strengths are higher than those of a conventional grade Ti–6Al–4V alloy at high strain rate only. In addition to compression tests we also conducted tensile loading tests on the laser-deposited alloy at both low and high strain rates (0.1/s and 1000/s). There is significant tension/compression asymmetry in the mechanical response under high-strain-rate loading. It was found that the quasi-static tensile fracturing exhibits typical composite fracture characteristic with quasi-cleavages and dimples, while the high-strain-rate fracturing is characterized by ductile fracture behavior.
Disordered carbon negative electrode for electrochemical capacitors and high-rate batteries
International Nuclear Information System (INIS)
Ogihara, Nobuhiro; Igarashi, Yoshiyuki; Kamakura, Ayumu; Naoi, Katsuhiko; Kusachi, Yuki; Utsugi, Koji
2006-01-01
In order to understand the properties of high-rate capability and cycleability for a disordered carbon negative electrode in LiPF 6 /PC based electrolyte solution, the cell performance tests with various rates and depth of discharges (DODs) has been studied by spectroscopic and electrochemical analyses. From the charge-discharge measurements, a surface carbon-edge redox reaction occurring between a carbonyl (C edge =O) and a lithium alkoxide (C edge -OLi) that delivers a large capacity was found fast and high cycleability at only shallow DOD (2.0-0.4 V). The limited or shallow charge-discharge cycling utilizing such facile and reversible action of the C edge =O/C edge -OLi of the disordered carbon is suited to an application for an negative electrode of asymmetric hybrid capacitors. A deep DOD discharge (2.0-0.0 V) revealed the existence of some complex processes involving a lithium cluster deposition at pores or microvoids as well as a lithium ion intercalation at graphene layers. The cluster deposition at pores was found to be relatively fast and reproducible. The lithium ion intercalation at graphenes and the subsequent cluster deposition at microvoids were found to be slow and degrade the cycleability after 100 cycles because of the accumulation of a thick and low-ion-conductive solid electrolyte interface (SEI) film on surface
Energy Technology Data Exchange (ETDEWEB)
Xie, Yijun; Guo, Lina [University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054 (China); Liu, Shuang, E-mail: shuangliu@uestc.edu.cn [University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054 (China); Wang, Qianfeng; Zhang, Shangjian; Liu, Yong [University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054 (China); Zhong, Zhiyong [University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu 610054 (China)
2017-06-21
Although there are many new scintillators being developed recently, CsI: Tl is still very efficient among them. The fluorescent lifetime is a very important parameter of CsI: Tl thin film and two series of experiments have been conducted to learn about it. Our experiments, however, have demonstrated that the deposition rate and the codoping of Eu{sup 2+} will significantly influence its fluorescent lifetime. In order to increase the efficiency of the imaging system, we intend to obtain a higher fluorescent lifetime for CsI: Tl thin film by controlling these two conditions. - Highlights: • We used vacuum vapor deposition method to grow the high-quality thin films. • The relationship between the deposition rate and the fluorescent lifetime of CsI: Tl thin film was tested. • Concentration of Eu on fluorescent lifetime of the CsI: Tl thin film was studied.
Horita, Susumu; Jain, Puneet
2018-03-01
We investigated the dependences of the deposition rate and residual OH content of SiO2 films on the concentration of trichloroethylene (TCE), which was added during deposition at low temperatures of 160-260 °C with the reactant gases of silicone oil (SO) and O3. The deposition rate depends on the TCE concentration and is minimum at a concentration of ˜0.4 mol/m3 at 200 °C. The result can be explained by surface and gas-phase reactions. Experimentally, we also revealed that the thickness profile is strongly affected by gas-phase reaction, in which the TCE vapor was blown directly onto the substrate surface, where it mixed with SO and O3. Furthermore, it was found that adding TCE vapor reduces residual OH content in the SiO2 film deposited at 200 °C because TCE enhances the dehydration reaction.
Validating Whole-Airway CFD Predictions of DPI Aerosol Deposition at Multiple Flow Rates.
Longest, P Worth; Tian, Geng; Khajeh-Hosseini-Dalasm, Navvab; Hindle, Michael
2016-12-01
The objective of this study was to compare aerosol deposition predictions of a new whole-airway CFD model with available in vivo data for a dry powder inhaler (DPI) considered across multiple inhalation waveforms, which affect both the particle size distribution (PSD) and particle deposition. The Novolizer DPI with a budesonide formulation was selected based on the availability of 2D gamma scintigraphy data in humans for three different well-defined inhalation waveforms. Initial in vitro cascade impaction experiments were conducted at multiple constant (square-wave) particle sizing flow rates to characterize PSDs. The whole-airway CFD modeling approach implemented the experimentally determined PSDs at the point of aerosol formation in the inhaler. Complete characteristic airway geometries for an adult were evaluated through the lobar bronchi, followed by stochastic individual pathway (SIP) approximations through the tracheobronchial region and new acinar moving wall models of the alveolar region. It was determined that the PSD used for each inhalation waveform should be based on a constant particle sizing flow rate equal to the average of the inhalation waveform's peak inspiratory flow rate (PIFR) and mean flow rate [i.e., AVG(PIFR, Mean)]. Using this technique, agreement with the in vivo data was acceptable with <15% relative differences averaged across the three regions considered for all inhalation waveforms. Defining a peripheral to central deposition ratio (P/C) based on alveolar and tracheobronchial compartments, respectively, large flow-rate-dependent differences were observed, which were not evident in the original 2D in vivo data. The agreement between the CFD predictions and in vivo data was dependent on accurate initial estimates of the PSD, emphasizing the need for a combination in vitro-in silico approach. Furthermore, use of the AVG(PIFR, Mean) value was identified as a potentially useful method for characterizing a DPI aerosol at a constant flow rate.
Preparation of highly dispersed PEM fuel cell catalysts using electroless deposition methods
Energy Technology Data Exchange (ETDEWEB)
Beard, K.D.; Schaal, M.T.; Van Zee, J.W.; Monnier, J.R. [Department of Chemical Engineering, University of South Carolina, Swearingen Engineering Center, 301 South Main Street, Columbia, SC 29208 (United States)
2007-03-30
A methodology for the electroless deposition (ED) of PtCl{sub 6}{sup 2-} using dimethylamine borane (DMAB) on a Rh-seeded carbon support has been developed for electrochemical and fuel cell applications. This procedure required seeding the carbon with a Rh-precursor catalyst via wet impregnation prior to the exposure of an aqueous ED bath containing PtCl{sub 6}{sup 2-}, DMAB, and sodium citrate (complexing/stabilizing agent). Kinetic parameters that affect the extent and rate of PtCl{sub 6}{sup 2-} deposition include concentrations of PtCl{sub 6}{sup 2-}, DMAB, and sodium citrate as well as pH and concentrations of Rh seed sites. A linear relationship between rate and extent of PtCl{sub 6}{sup 2-} deposition and DMAB and Rh concentrations was found while the citrate concentration had little effect on rate and a modest effect on extent. Lastly, extent of PtCl{sub 6}{sup 2-} deposition showed a maximum with respect to pH. Characterization of the Rh-seeded, carbon support by transmission electron microscopy (TEM) shows that the Rh particle diameters remain constant at 33-43 Aa as the Rh weight loading increases from 0.4% to 2.2% to 4.4%. Further, after deposition of similar loadings of Pt, TEM analysis shows Pt particle diameters decrease with increasing Rh loading, since equal amounts of Pt were deposited on greater numbers of Rh seed particles. This pattern suggests a shell-core geometry, where Pt is deposited more or less uniformly around a Rh core. (author)
A high-efficiency solution-deposited thin-film photovoltaic device
Energy Technology Data Exchange (ETDEWEB)
Mitzi, David B; Yuan, Min; Liu, Wei; Chey, S Jay; Schrott, Alex G [IBM T. J. Watson Research Center, Yorktown Heights, NY (United States); Kellock, Andrew J; Deline, Vaughn [IBM Almaden Research Center, San Jose, CA (United States)
2008-10-02
High-quality Cu(In,Ga)Se{sub 2} (CIGS) films are deposited from hydrazine-based solutions and are employed as absorber layers in thin-film photovoltaic devices. The CIGS films exhibit tunable stoichiometry and well-formed grain structure without requiring post-deposition high-temperature selenium treatment. Devices based on these films offer power conversion efficiencies of 10% (AM1.5 illumination). (Abstract Copyright [2008], Wiley Periodicals, Inc.)
International Nuclear Information System (INIS)
Lim, Jongmin; Lee, Chongmu
2006-01-01
The hexavalent chromium used in chromium plating is so toxic that it is very hazardous to human body and possibly causes cancer in humans. Therefore, it is indispensable to develop an alternative deposition technique. Dependences of the deposition rate, the phases, the hardness, the surface roughness and the corrosion-resistance of CrN x deposited on the high speed steel substrate by using a dual ion beam sputtering system on the rf-power were investigated to see the feasibility of sputtering as an alternative technique for chromium plating. The dual ion beam sputtering system used in this study was designed in such a way as the primary argon ion beam and the secondary nitrogen ion beam are injected toward the target and the substrate, respectively so that the chromium atoms at the chromium target surface may not nearly react with nitrogen atoms. The hardness and the surface roughness were measured by a micro-Vicker's hardness tester and an atomic force microscope (AFM), respectively. X-ray diffraction analyses were performed to identify phases in the films. The deposition rate of CrN x depends more strongly upon the rf-power for argon ion beam than that for nitrogen ion beam. The hardness of the CrN x film is highest when the volume percent of the Cr 2 N phase in the film is highest. Amorphous films are obtained when the rf-power for nitrogen ion beam is much higher than that for argon ion beam. The CrN x film deposited by using the sputtering technique under the optimal condition provides corrosion-resistance comparable to that of the electroplated chromium
Electrospray ionization deposition of BSA under vacuum conditions
Hecker, Dominic; Gloess, Daniel; Frach, Peter; Gerlach, Gerald
2015-05-01
Vacuum deposition techniques like thermal evaporation and CVD with their precise layer control and high layer purity often cannot be applied for the deposition of chemical or biological molecules. The molecules are usually decomposed by heat. To overcome this problem, the Electrospray ionization (ESI) process known from mass spectroscopy is employed to transfer molecules into vacuum and to deposit them on a substrate. In this work, a homemade ESI tool was used to deposit BSA (Bovine serum albumin) layers with high deposition rates. Solutions with different concentrations of BSA were prepared using a methanol:water (MeOH:H2O) mixture (1:1) as solvent. The influence of the substrate distance on the deposition rate and on the transmission current was analyzed. Furthermore, the layer thickness distribution and layer adhesion were investigated.
Turnover of texture in low rate sputter-deposited nanocrystalline molybdenum films
International Nuclear Information System (INIS)
Druesedau, T.P.; Klabunde, F.; Loehmann, M.; Hempel, T.; Blaesing, J.
1997-01-01
The crystallite size and orientation in molybdenum films prepared by magnetron sputtering at a low rate of typical 1 (angstrom)s and a pressure of 0.45 Pa was investigated by X-ray diffraction and texture analysis. The surface topography was studied using atomic force microscopy. Increasing the film thickness from 20 nm to 3 microm, the films show a turnover from a (110) fiber texture to a (211) mosaic-like texture. In the early state of growth (20 nm thickness) the development of dome-like structures on the surface is observed. The number of these structures increases with film thickness, whereas their size is weakly influenced. The effect of texture turnover is reduced by increasing the deposition rate by a factor of six, and it is absent for samples mounted above the center of the magnetron source. The effect of texture turnover is related to the bombardment of the films with high energetic argon neutrals resulting from backscattering at the target under oblique angle and causing resputtering. Due to the narrow angular distribution of the reflected argon, bombardment of the substrate plane is inhomogeneous and only significant for regions close to the erosion zone of the magnetron
High-power sputtering employed for film deposition
International Nuclear Information System (INIS)
Shapovalov, V I
2017-01-01
The features of high-power magnetron sputtering employed for the films’ deposition are reviewed. The main physical phenomena accompanying high-power sputtering including ion-electron emission, gas rarefaction, ionization of sputtered atoms, self-sputtering, ion sound waves and the impact of the target heating are described. (paper)
Laser deposition rates of thin films of selected metals and alloys
DEFF Research Database (Denmark)
Cazzaniga, Andrea Carlo; Canulescu, Stela; Schou, Jørgen
Thin films of Cu, Zn and Sn as well as mixtures of these elements have been produced by Pulsed Laser Deposition (PLD). The deposition rate of single and multicomponent metallic targets was determined. The strength of PLD is that the stoichiometry of complex compounds, even of complicated alloys...... or metal oxides, can be preserved from target to film. We apply this technique to design films of a mixture of Cu, Zn and Sn, which are constituents of the chalcogenide CZTS, which has a composition close to Cu2ZnSnS4. This compound is expected to be an important candidate for absorbers in new solar cells...... for alloys of the different elements as well as compounds with S will be presented....
International Nuclear Information System (INIS)
Zaini Hamzah; Che Yasmin Amirudin; Ahmad Saat; Ahmad Saat; Ab Khalik Wood
2014-01-01
The soil erosion and deposition in the hilly area is a great concern for the planters. In this study, the tea plantation was chosen to quantify the rates of soil erosion and deposition for it will provide information on the improvement of soil conditions and cost reduction of fertilizer consumption. The aims of this research are to determine the rate of soil erosion and deposition using environmental radionuclide, 137 Cs. Soil profile samples were collected by using scrapper plate and two cores soil sample were collected in the undisturbed forests area nearby. The 137 Cs activity concentration was measured using low background coaxial hyper pure germanium detector gamma spectrometer based on 137 Cs gamma energy peak at 661.66 keV. The highest erosion rate using Proportional Models and Mass Balance Model 1 was found in point HE top area which is 52.39 t ha -1 yr -1 and 95.53 t ha -1 yr -1 respectively while the lowest at location HF top which is 4.78 t ha -1 yr -1 and 4.97 t ha -1 yr -1 . The deposition rate was higher in HF center which is 216.82 t ha -1 yr -1 and 97.51 t ha -1 yr -1 and the lowest at HE center which is 0.05 t ha -1 yr -1 for both models used. (author)
Entrainment and deposition rates of droplets in annular two-phase flow
International Nuclear Information System (INIS)
Kataoka, I.; Ishii, M.
1986-01-01
The droplet entrainment from a liquid film is important to the mass, momentum, and energy transfer process in annular two-phase flow. For example, the amount of entrainment as well as the rate of entrainment significantly affect the occurrences of the dryout, whereas the post-CHF heat transfer depends strongly on the entrainment and droplet sizes. Despite the importance of the entrainment rate, there have been no satisfactory correlations available in the literature. In view of these, correlations for entrainment rate covering both entrance region and equilibrium region were developed from a simple model in collaboration with data. Results show that the entrainment rate varies considerably in the entrainment-development region. However, at a certain distance from an inlet it attains an equilibrium value. A simple approximate correlation was obtained for the equilibrium state where entrainment rate and deposition rate becomes equal. The result indicates that the equilibrium entrainment rate is proportional to Weber number based on the hydraulic diameter of a tube. 34 references, 14 figures
DEFF Research Database (Denmark)
Purice, Andreea; Schou, Jørgen; Kingshott, P.
2007-01-01
Matrix assisted pulsed laser evaporation (MAPLE) has been applied for deposition of thin polyethylene glycol (PEG) films with infrared laser light at 1064 nm. We have irradiated frozen targets (of 1 wt.% PEG dissolved in water) and measured the deposition rate in situ with a quartz crystal 2...... microbalance. The laser fluence needed to produce PEG films turned out to be unexpectedly high with a threshold of 9 J/cm(2) and the deposition rate was much lower than that with laser light at 355 nm. Results from matrix assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI......-TOF-MS) analysis demonstrate that the chemistry, molecular weight and polydispersity of the PEG films were identical to the starting material. Studies of the film surface with scanning electron microscopy (SEM) indicate that the Si-substrate is covered by a relatively homogenous PEG film with few bare spots. (c...
High power RF window deposition apparatus, method, and device
Ives, Lawrence R.; Lucovsky, Gerald; Zeller, Daniel
2017-07-04
A process for forming a coating for an RF window which has improved secondary electron emission and reduced multipactor for high power RF waveguides is formed from a substrate with low loss tangent and desirable mechanical characteristics. The substrate has an RPAO deposition layer applied which oxygenates the surface of the substrate to remove carbon impurities, thereafter has an RPAN deposition layer applied to nitrogen activate the surface of the substrate, after which a TiN deposition layer is applied using Titanium tert-butoxide. The TiN deposition layer is capped with a final RPAN deposition layer of nitridation to reduce the bound oxygen in the TiN deposition layer. The resulting RF window has greatly improved titanium layer adhesion, reduced multipactor, and is able to withstand greater RF power levels than provided by the prior art.
International Nuclear Information System (INIS)
Kim, Sung-Ryong; Choudhury, Moinul Haque; Kim, Won-Ho; Kim, Gon-Ho
2010-01-01
Plasma polymer coatings were deposited from hexamethyldisiloxane on polyethylene terephthalate (PET) substrates while varying the operating conditions, such as the Ar and O 2 flow rates, at a fixed radio frequency power of 300 W. The water vapor transmission rate (WVTR) of the untreated PET was 54.56 g/m 2 /day and was decreased after depositing the silicon oxide (SiO x ) coatings. The minimum WVTR, 0.47 g/m 2 /day, was observed at Ar and O 2 flow rates of 4 and 20 sccm, respectively, with a coating thickness of 415.44 nm. The intensity of the peaks for the Si-O-Si bending at 800-820 cm -1 and Si-O-Si stretching at 1000-1150 cm -1 varied depending on the Ar and O 2 flow rates. The contact angle of the SiO x coated PET increased as the Ar flow rate was increased from 2 to 8 sccm at a fixed O 2 flow rate of 20 sccm. It decreased gradually as the oxygen flow rate increased from 12 to 28 sccm at a fixed Ar carrier gas flow rate. The examination by atomic force microscopy revealed a correlation of the SiO x morphology and the water vapor barrier performance with the Ar and O 2 flow rates. The roughness of the deposited coatings increased when either the O 2 or Ar flow rate was increased.
Deposition rates of atmospheric particulates determined from 210Pb measurements in soils and air
International Nuclear Information System (INIS)
Likuku, A. S.; Branford, D.
2011-01-01
Deposition rates of atmospheric particles were determined using previously published 210P b data in soils and air. The dry deposition velocities for moorland and woodland soils were 2.2 ± 1.8 and 9 ± 2 mm · s - 1 , respectively. The 210P b concentration in rain was calculated to be 94 ± 10 mBq · L - 1. The large (∼ 4 times) deposition velocities in woodland relative to moorland soils is an indication of the degree of accumulation of particles, and most possibly contaminants within woodland soils, which is of practical importance in the mitigation of pollutant concentrations in urban areas by planting trees. (authors)
Directory of Open Access Journals (Sweden)
Maryam Jamshidnejad
2011-01-01
Full Text Available In this paper, a 2D stimulation model, FACET, is used for investigation of the relation between micro structure and deposition conditions such as substrate temperature, deposition rate and deposition angle of Ag thin films. It is observed that by increasing the deposition rate in standard conditions providing that the temperature of substrate is low, the average of final grain size is decreased. While, in deposition with angle flux the average of final grain size is increased.
International Nuclear Information System (INIS)
Jones, J.A.
1980-03-01
Radioactive material may be discharged to atmosphere in small quantities during the normal operation of a nuclear installation as part of a considered waste management practice. Estimates of the individual and collective dose equivalent rates resulting from such a discharge are required in a number of contexts: for example, in assessing compliance with dose limits, in estimating the radiological impact of the discharge and as an input into optimisation studies. The suite of programs which has been developed to undertake such calculations is made up of a number of independent modules one of which, ESCLOUD, is described in this report. The ESCLOUD program evaluates, as a function of distance and direction from the release point, the air concentration, deposition rate and external β and γ doses from airborne and deposited activity. The air concentration and deposition rate can be used as input to other modules for calculating inhalation and ingestion doses. (author)
Simulation of Cooling Rate Effects on Ti-48Al-2Cr-2Nb Crack Formation in Direct Laser Deposition
Yan, Lei; Li, Wei; Chen, Xueyang; Zhang, Yunlu; Newkirk, Joe; Liou, Frank; Dietrich, David
2017-03-01
Transient temperature history is vital in direct laser deposition (DLD) as it reveals the cooling rate at specific temperatures. Cooling rate directly relates to phase transformation and types of microstructure formed in deposits. In this paper, finite element analysis simulation was employed to study the transient temperature history and cooling rate at different experimental setups in the Ti-48Al-2Cr-2Nb DLD process. An innovative prediction strategy was developed to model with a moving Gaussian distribution heat source and element birth and death technology in ANSYS®, and fabricate crack-free deposits. This approach helps to understand and analyze the impact of cooling rate and also explain phase information gathered from x-ray diffraction.
Ahmed, Bilal; Shahid, Muhammad; Nagaraju, Doddahalli H.; Anjum, Dalaver H.; Hedhili, Mohamed N.; Alshareef, Husam N.
2015-01-01
We demonstrate an effective strategy to overcome the degradation of MoO3 nanorod anodes in Lithium (Li) ion batteries at high rate cycling. This is achieved by conformal nanoscale surface passivation of the MoO3 nanorods by HfO2 using atomic layer deposition (ALD). At high current density such as 1500 mA/g, the specific capacity of HfO2 coated MoO3 electrodes is 68% higher than bare MoO3 electrodes after 50 charge/discharge cycles. After 50 charge/discharge cycles, HfO2 coated MoO3 electrodes exhibited specific capacity of 657 mAh/g, on the other hand, bare MoO3 showed only 460 mAh/g. Furthermore, we observed that HfO2 coated MoO3 electrodes tend to stabilize faster than bare MoO3 electrodes because nanoscale HfO2 layer prevents structural degradation of MoO3 nanorods. Additionally, the growth temperature of MoO3 nanorods and the effect of HfO2 layer thickness was studied and found to be important parameters for optimum battery performance. The growth temperature defines the microstructural features and HfO2 layer thickness defines the diffusion coefficient of Li–ions through the passivation layer to the active material. Furthermore, ex–situ HRTEM, X–ray photoelectron spectroscopy (XPS), Raman spectroscopy and X–ray diffraction was carried out to explain the capacity retention mechanism after HfO2 coating.
Ahmed, Bilal
2015-06-03
We demonstrate an effective strategy to overcome the degradation of MoO3 nanorod anodes in Lithium (Li) ion batteries at high rate cycling. This is achieved by conformal nanoscale surface passivation of the MoO3 nanorods by HfO2 using atomic layer deposition (ALD). At high current density such as 1500 mA/g, the specific capacity of HfO2 coated MoO3 electrodes is 68% higher than bare MoO3 electrodes after 50 charge/discharge cycles. After 50 charge/discharge cycles, HfO2 coated MoO3 electrodes exhibited specific capacity of 657 mAh/g, on the other hand, bare MoO3 showed only 460 mAh/g. Furthermore, we observed that HfO2 coated MoO3 electrodes tend to stabilize faster than bare MoO3 electrodes because nanoscale HfO2 layer prevents structural degradation of MoO3 nanorods. Additionally, the growth temperature of MoO3 nanorods and the effect of HfO2 layer thickness was studied and found to be important parameters for optimum battery performance. The growth temperature defines the microstructural features and HfO2 layer thickness defines the diffusion coefficient of Li–ions through the passivation layer to the active material. Furthermore, ex–situ HRTEM, X–ray photoelectron spectroscopy (XPS), Raman spectroscopy and X–ray diffraction was carried out to explain the capacity retention mechanism after HfO2 coating.
Energy Technology Data Exchange (ETDEWEB)
Singla, Shilpa; Pal, Bonamali, E-mail: bpal@thapar.edu
2013-11-15
Graphical abstract: Highly porous ZnS microsphere of size 2–5 μm having large surface area ca. 173.14 m{sup 2} g{sup −1} exhibits superior photocatalytic activity for the oxidation of 4-nitrophenol under UV light irradiation. The rate of photooxidation has been significantly improved by Au and Pt deposition and after sintering, respectively, due to rapid electron acceptance by metal from photoexcited ZnS and growth of crystalline ZnS phase. - Highlights: • Photoactive ZnS microsphere of size 2–5 μm was prepared by hydrothermal route. • Highly porous cubic spherical ZnS crystals possess a large surface area, 173 m{sup 2} g{sup −1}. • 1 wt% Au and Pt photodeposition highly quenched the photoluminescence at 437 nm. • Sintering and metal loading notably improve the photooxidation rate of 4-nitrophenol. • Pt co-catalyst always exhibits superior photoactivity of ZnS microsphere than Au. - Abstract: This work highlights the enhanced photocatalytic activity of porous ZnS microspheres after Au and Pt deposition and heat treatment at 500 °C for 2 h. Microporous ZnS particles of size 2–5 μm with large surface area 173.14 m{sup 2} g{sup −1} and pore volume 0.0212 cm{sup 3} g{sup −1} were prepared by refluxing under an alkaline medium. Photoluminescence of ZnS at 437 nm attributed to sulfur or zinc vacancies were quenched to 30% and 49%, respectively, after 1 wt% Au and Pt loading. SEM images revealed that each ZnS microparticle consist of several smaller ZnS spheres of size 2.13 nm as calculated by Scherrer's equation. The rate of photooxidation of 4-nitrophenol (10 μM) under UV (125 W Hg arc–10.4 mW/cm{sup 2}) irradiation has been significantly improved by Au and Pt deposition followed by sintering due to better electron capturing capacity of deposited metals and growth of crystalline ZnS phase with less surface defects.
Dry deposition of gaseous oxidized mercury in Western Maryland.
Castro, Mark S; Moore, Chris; Sherwell, John; Brooks, Steve B
2012-02-15
The purpose of this study was to directly measure the dry deposition of gaseous oxidized mercury (GOM) in western Maryland. Annual estimates were made using passive ion-exchange surrogate surfaces and a resistance model. Surrogate surfaces were deployed for seventeen weekly sampling periods between September 2009 and October 2010. Dry deposition rates from surrogate surfaces ranged from 80 to 1512 pgm(-2)h(-1). GOM dry deposition rates were strongly correlated (r(2)=0.75) with the weekly average atmospheric GOM concentrations, which ranged from 2.3 to 34.1 pgm(-3). Dry deposition of GOM could be predicted from the ambient air concentrations of GOM using this equation: GOM dry deposition (pgm(-2)h(-1))=43.2 × GOM concentration-80.3. Dry deposition velocities computed using GOM concentrations and surrogate surface GOM dry deposition rates, ranged from 0.2 to 1.7 cms(-1). Modeled dry deposition rates were highly correlated (r(2)=0.80) with surrogate surface dry deposition rates. Using the overall weekly average surrogate surface dry deposition rate (369 ± 340 pg m(-2)h(-1)), we estimated an annual GOM dry deposition rate of 3.2 μg m(-2)year(-1). Using the resistance model, we estimated an annual GOM dry deposition rate of 3.5 μg m(-2)year(-1). Our annual GOM dry deposition rates were similar to the dry deposition (3.3 μg m(-2)h(-1)) of gaseous elemental mercury (GEM) at our site. In addition, annual GOM dry deposition was approximately 1/2 of the average annual wet deposition of total mercury (7.7 ± 1.9 μg m(-2)year(-1)) at our site. Total annual mercury deposition from dry deposition of GOM and GEM and wet deposition was approximately 14.4 μg m(-2)year(-1), which was similar to the average annual litterfall deposition (15 ± 2.1 μg m(-2)year(-1)) of mercury, which was also measured at our site. Copyright © 2012 Elsevier B.V. All rights reserved.
International Nuclear Information System (INIS)
Agubra, Victor A.; Fergus, Jeffrey W.; Fu, Rujian; Choe, Song-yul
2014-01-01
Highlights: • Raising the battery cycling potential increased the rate of side reaction. • Growth of deposit layer thickness at the electrode/electrolyte interface at high SOC. • A significant amount of lithium was consumed in forming the deposit layer. • Some of the lithium were “trapped” in the graphite after the discharge cycle. - Abstract: The formation of the solid electrolyte interface (SEI) layer on the surface of the anode electrode of a lithium ion battery prevents further electrolyte decomposition reaction. However, at certain battery operating conditions, the SEI breakdown leading to more electrolyte decomposition reactions that form several species on the anode electrode surface. This paper focuses on the effect of battery potential and charge rate on the decomposition side reaction on the anode electrode of a lithium ion polymer battery, as a result of the breakdown of the SEI layer. The results from this study indicate that raising the state of charge (SOC) increases the rate of the electrolyte decomposition side reaction that resulted in formation of a thick deposit layer at the electrolyte/electrolyte interface. This deposit layer contains lithium that can no longer participate in the reversible electrochemical reaction. In addition, at high cycling potential and charge rates the amount of lithium in the graphite after complete cell discharge increased due to the entrapment of lithium in the graphite. The amount of irreversible capacity loss for the batteries cycled at high potential and current correlates with the amount of trapped lithium in the graphite and the growth of the deposit layer thickness at the electrode/electrolyte interface
The Effect of Deposition Rate on Electrical, Optical and Structural Properties of ITO Thin Films
Directory of Open Access Journals (Sweden)
P. S. Raghupathi
2005-01-01
Full Text Available Indium tin oxide (ITO thin films have been prepared using the reactive evaporation technique on glass substrates in an oxygen atmosphere. It is found that the deposition rate plays prominent role in controlling the electrical and optical properties of the ITO thin films. Resistivity, electrical conductivity, activation energy, optical transmission and band gap energy were investigated. A transmittance value of more than 90% in the visible region of the spectrum and an electrical conductivity of 3x10–6 Ωm has been obtained with a deposition rate of 2 nm/min. XRD studies showed that the films are polycrystalline.
Influence of travel speed on spray deposition uniformity from an air-assisted variable-rate sprayer
A newly developed LiDAR-guided air-assisted variable-rate sprayer for nursery and orchard applications was tested at various travel speeds to compare its spray deposition and coverage uniformity with constant-rate applications. Spray samplers, including nylon screens and water-sensitive papers (WSP)...
Energy Technology Data Exchange (ETDEWEB)
Chiarella, F., E-mail: fabio.chiarella@spin.cnr.it; Barra, M.; Ciccullo, F.; Cassinese, A. [CNR-SPIN and Physics Department, University of Naples, Piazzale Tecchio 80, I-80125 Naples (Italy); Toccoli, T.; Aversa, L.; Tatti, R.; Verucchi, R. [IMEM-CNR-FBK Division of Trento, Via alla Cascata 56/C, I-38123 Povo (Italy); Iannotta, S. [IMEM-CNR, Parco Area delle Scienze 37/A, I-43124 Parma (Italy)
2014-04-07
In this paper, we report on the fabrication of N,N′-1H,1H-perfluorobutil dicyanoperylenediimide (PDIF-CN{sub 2}) organic thin-film transistors by Supersonic Molecular Beam Deposition. The devices exhibit mobility up to 0.2 cm{sup 2}/V s even if the substrate is kept at room temperature during the organic film growth, exceeding by three orders of magnitude the electrical performance of those grown at the same temperature by conventional Organic Molecular Beam Deposition. The possibility to get high-mobility n-type transistors avoiding thermal treatments during or after the deposition could significantly extend the number of substrates suitable to the fabrication of flexible high-performance complementary circuits by using this compound.
International Nuclear Information System (INIS)
Morrison, Jonathan; Cooper, Christopher; Ponton, Clive; Connolly, Brian; Banks, Andrew
2012-09-01
In any water-cooled nuclear reactor, the corrosion of the structural materials in contact with the coolant and the deposition of the resulting oxidised species has long been an operational concern within the power generation industry. Corrosion of the structural materials at all points in the reactor leads to low concentrations of oxidised metal species in the coolant water. The oxidised metal species can subsequently be deposited out as CRUD deposits at various points around the reactor's primary and secondary loops. The deposition of soluble oxidised material at any location in the reactor cooling system is undesirable due to several effects; deposits have a porous structure, capable of incorporating radiologically active material (forming out of core radiation fields) and concentrating aggressively corrosive chemicals, which exacerbate environmental degradation of structural and fuel-cladding materials. Deposits on heat transfer surfaces also limit efficiency of the system as a whole. The work in this programme is an attempt to determine and understand the fundamental corrosion and deposition behaviour under controlled, simulated reactor conditions. The rates of corrosion of structural materials within pressurised water reactors are heavily dependent on the condition of the exposed surface. The effect of mechanical grinding and of electropolishing on the corrosion rate and structure of the resultant oxide film formed on grade 316L stainless steel exposed to high purity water, modified to pH 9.5 and 10.5 at temperatures between 200 and 300 deg. C and pressures of up to 100 bar will be investigated. The corrosion of stainless steel in water via electrochemical oxidation leads to the formation of surface iron, nickel and chromium based spinels. Low concentrations of these spinels can be found dissolved in the coolant water. The solubility of magnetite, stainless steels' major corrosion product, in high purity water will be studied at pH 9.5 to 10.5 at
Tong, Meiping; Camesano, Terri A; Johnson, William P
2005-05-15
The transport of bacterial strain DA001 was examined in packed quartz sand under a variety of environmentally relevant ionic strength and flow conditions. Under all conditions, the retained bacterial concentrations decreased with distance from the column inlet at a rate that was faster than loglinear, indicating that the deposition rate coefficient decreased with increasing transport distance. The hyperexponential retained profile contrasted againstthe nonmonotonic retained profiles that had been previously observed for this same bacterial strain in glass bead porous media, demonstrating that the form of deviation from log-linear behavior is highly sensitive to system conditions. The deposition rate constants in quartz sand were orders of magnitude below those expected from filtration theory, even in the absence of electrostatic energy barriers. The degree of hyperexponential deviation of the retained profiles from loglinear behavior did not decrease with increasing ionic strength in quartz sand. These observations demonstrate thatthe observed low adhesion and deviation from log-linear behavior was not driven by electrostatic repulsion. Measurements of the interaction forces between DA001 cells and the silicon nitride tip of an atomic force microscope (AFM) showed that the bacterium possesses surface polymers with an average equilibrium length of 59.8 nm. AFM adhesion force measurements revealed low adhesion affinities between silicon nitride and DA001 polymers with approximately 95% of adhesion forces having magnitudes responsible for the low adhesion to silicon nitride, indicating that steric interactions from extracellular polymers controlled DA001 adhesion deficiency and deviation from log-linear behavior on quartz sand.
Nanosecond laser ablation and deposition of silver, copper, zinc and tin
DEFF Research Database (Denmark)
Cazzaniga, Andrea Carlo; Ettlinger, Rebecca Bolt; Canulescu, Stela
2014-01-01
Nanosecond pulsed laser deposition of different metals (Ag, Cu, Sn, Zn) has been studied in high vacuum at a laser wavelength of 355 nm and pulse length of 6 ns. The deposition rate is roughly similar for Sn, Cu and Ag, which have comparable cohesive energies, and much higher for the deposition...... of Zn which has a low cohesive energy. The deposition rate for all metals is strongly correlated with the total ablation yield, i.e., the total mass ablated per pulse, reported in the literature except for Sn, for which the deposition rate is low, but the total ablation yield is high. This may...... be explained by the continuous erosion by nanoparticles during deposition of the Sn films which appear to have a much rougher surface than those of the other metals studied in the present work....
Pavlova, Viola; Nabe-Nielsen, Jacob; Dietz, Rune; Svenning, Jens-Christian; Vorkamp, Katrin; Rigét, Frank Farsø; Sonne, Christian; Letcher, Robert J; Grimm, Volker
2014-01-01
Climate change will increasingly affect the natural habitat and diet of polar bears (Ursus maritimus). Understanding the energetic needs of polar bears is therefore important. We developed a theoretical method for estimating polar bear food consumption based on using the highly recalcitrant polychlorinated biphenyl (PCB) congener, 2,2',4,4',55-hexaCB (CB153) in bear adipose tissue as an indicator of food intake. By comparing the CB153 tissue concentrations in wild polar bears with estimates from a purposely designed individual-based model, we identified the possible combinations of field metabolic rates (FMR) and CB153 deposition efficiencies in East Greenland polar bears. Our simulations indicate that if 30% of the CB153 consumed by polar bear individuals were deposited into their adipose tissue, the corresponding FMR would be only two times the basal metabolic rate. In contrast, if the modelled CB153 deposition efficiency were 10%, adult polar bears would require six times more energy than that needed to cover basal metabolism. This is considerably higher than what has been assumed for polar bears in previous studies though it is similar to FMRs found in other marine mammals. An implication of this result is that even relatively small reductions in future feeding opportunities could impact the survival of East Greenland polar bears.
The deposition of thin metal films at the high-intensity pulsed-ion-beam influence on the metals
International Nuclear Information System (INIS)
Remnev, G.E.; Zakoutaev, A.N.; Grushin, I.I.; Matvenko, V.M.; Potemkin, A.V.; Ryzhkov, V.A.; Chernikov, E.V.
1996-01-01
A high-intensity pulsed ion beam with parameters: ion energy 350-500 keV, ion current density at a target > 200 A/cm 2 , pulse duration 60 ns, was used for metal deposition. The film deposition rate was 0.6-4.0 mm/s. Transmission electron microscopy/transmission electron diffraction investigations of the copper target-film system were performed. The impurity content in the film was determined by x-ray fluorescence analysis and secondary ion mass spectrometry. The angular distributions of the ablated plasma were measured. (author). 2 figs., 7 refs
The deposition of thin metal films at the high-intensity pulsed-ion-beam influence on the metals
Energy Technology Data Exchange (ETDEWEB)
Remnev, G E; Zakoutaev, A N; Grushin, I I; Matvenko, V M; Potemkin, A V; Ryzhkov, V A [Tomsk Polytechnic Univ. (Russian Federation). Nuclear Physics Inst.; Ivanov, Yu F [Construction Academy, Tomsk (Russian Federation); Chernikov, E V [Siberian Physical Technical Institute, Tomsk (Russian Federation)
1997-12-31
A high-intensity pulsed ion beam with parameters: ion energy 350-500 keV, ion current density at a target > 200 A/cm{sup 2}, pulse duration 60 ns, was used for metal deposition. The film deposition rate was 0.6-4.0 mm/s. Transmission electron microscopy/transmission electron diffraction investigations of the copper target-film system were performed. The impurity content in the film was determined by x-ray fluorescence analysis and secondary ion mass spectrometry. The angular distributions of the ablated plasma were measured. (author). 2 figs., 7 refs.
Directory of Open Access Journals (Sweden)
Yu-Kuang Liao
2017-04-01
Full Text Available Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced sulfide nanoparticles (NPs with controllable thickness down to a few nanometers, based on thermal decomposition. This provides high-coverage, homogeneous thickness, and large-area deposition over a rough surface, with little material loss or liquid chemical waste, and deposition rates of 10 nm/min. This technique can potentially replace conventional thin-film deposition methods, such as atomic layer deposition (ALD and chemical bath deposition (CBD as used by the Cu(In,GaSe2 (CIGS thin-film solar cell industry for decades. We demonstrate 32% improvement of CIGS thin-film solar cell efficiency in comparison to reference devices prepared by conventional CBD deposition method by depositing the ZnS NPs buffer layer using the new process. The new ZnS NPs layer allows reduction of an intrinsic ZnO layer, which can lead to severe shunt leakage in case of a CBD buffer layer. This leads to a 65% relative efficiency increase.
Are Banks Passive Liquidity Backstops? Deposit Rates and Flows during the 2007-2009 Crisis
Viral V. Acharya; Nada Mora
2012-01-01
Can banks maintain their advantage as liquidity providers when they are heavily exposed to a financial crisis? The standard argument - that banks can - hinges on deposit inflows that are seeking a safe haven and provide banks with a natural hedge to fund drawn credit lines and other commitments. We shed new light on this issue by studying the behavior of bank deposit rates and inflows during the 2007-09 crisis. Our results indicate that the role of the banking system as a stabilizing liquidit...
Rao, Xi; Guyon, Cédric; Ognier, Stephanie; Da Silva, Bradley; Chu, Chenglin; Tatoulian, Michaël; Hassan, Ali Abou
2018-05-01
Immobilization of colloidal particles (e.g. gold nanoparticles (AuNps)) on the inner surface of micro-/nano- channels has received a great interest for catalysis. A novel catalytic ozonation setup using a gold-immobilized microchannel reactor was developed in this work. To anchor AuNps, (3-aminopropyl) triethoxysilane (APTES) with functional amine groups was deposited using plasma enhanced chemical vapor deposition (PECVD) process. The results clearly evidenced that PECVD processing exhibited relatively high efficiency for grafting amine groups and further immobilizing AuNPs. The catalytic activity of gold immobilized microchannel was evaluated by pyruvic acid ozonation. The decomposition rate calculated from High Performance Liquid Chromatography (HPLC) indicated a much better catalytic performance of gold in microchannel than that in batch. The results confirmed immobilizing gold nanoparticles on plasma deposited APTES for preparing catalytic microreactors is promising for the wastewater treatment in the future.
Czech Academy of Sciences Publication Activity Database
Strobel, C.; Leszczynska, B.; Merkel, U.; Kuske, J.; Fischer, D.D.; Albert, M.; Holovský, Jakub; Michard, S.
2015-01-01
Roč. 143, Dec (2015), 347-353 ISSN 0927-0248 R&D Projects: GA MŠk 7E12029 EU Projects: European Commission(XE) 283501 - Fast Track Institutional support: RVO:68378271 Keywords : VHF * PECVD * microcrystalline silicon * solar cell * high rate * high efficiency Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 4.732, year: 2015
One-dimensional analysis of the rate of plasma-assisted sputter deposition
International Nuclear Information System (INIS)
Palmero, A.; Rudolph, H.; Habraken, F. H. P. M.
2007-01-01
In this article a recently developed model [A. Palmero, H. Rudolph, and F. H. P. M. Habraken, Appl. Phys. Lett. 89, 211501 (2006)] is applied to analyze the transport of sputtered material from the cathode toward the growing film when using a plasma-assisted sputtering deposition technique. The argon pressure dependence of the deposition rate of aluminum, silicon, vanadium, chromium, germanium, tantalum, and tungsten under several different experimental conditions has been analyzed by fitting experimental results from the literature to the above-mentioned theory. Good fits are obtained. Three quantities are deduced from the fit: the temperature of the cathode and of the growing film, and the value of the effective cross section for thermalization due to elastic scattering of a sputtered particle on background gas atoms. The values derived from the fits for the growing film and cathode temperature are very similar to those experimentally determined and reported in the literature. The effective cross sections have been found to be approximately the corresponding geometrical cross section divided by the average number of collisions required for the thermalization, implying that the real and effective thermalization lengths have a similar value. Finally, the values of the throw distance appearing in the Keller-Simmons model, as well as its dependence on the deposition conditions have been understood invoking the values of the cathode and film temperature, as well as of the value of the effective cross section. The analysis shows the overall validity of this model for the transport of sputtered particles in sputter deposition
High dietary protein decreases fat deposition induced by high-fat and high-sucrose diet in rats
Chaumontet, C.; Even, P.C.; Schwarz, Jessica; Simonin-Foucault, A.; Piedcoq, J.; Fromentin, G.; Tomé, D.; Azzout-Marniche, D.
2015-01-01
High-protein diets are known to reduce adiposity in the context of high carbohydrate and Western diets. However, few studies have investigated the specific high-protein effect on lipogenesis induced by a high-sucrose (HS) diet or fat deposition induced by high-fat feeding. We aimed to determine the
Regional aerosol deposition in human upper airways
International Nuclear Information System (INIS)
Swift, D.L.
1989-01-01
During the report period significant progress on the quantitative understanding of regional upper airway deposition of airborne particle has been realized. Replicate models of the human upper airways obtained from post-mortem casting of the nasal, oral, pharyngeal, laryngeal and upper tracheal regions and in vivo magnetic resonance imaging (MRI) of the same regions of adults and children have been employed to determine the overall and local deposition characteristics of aerosols in the ultrafine (1--100 μm diameter) and fine (0.8--12 μm diameter) region. Studies have been carried out for both nasal and oral breathing during inspiratory and expiratory flow at constant flow rates representative of rest and states of exercise. The results of these investigations indicate that particles in the size range of ''unattached'' radon progeny (1--3 nm) are deposited in both the nasal and oral passages with high efficiency (60--80%) for both inspiration and expiration, with the nasal deposition being somewhat greater (5--10%) than oral deposition. The effect of flow rate on upper airway deposition for both pathways is not great; data analysis indicates that the deposition for all flow rates from 4--50 liters/minute can be grouped by plotting deposition vs Q- 1/8 , where Q is flow rate, a far weaker dependency than observed for inertial deposition. Diffusional transport is the primary mechanism of deposition, and size dependence can be accounted for by plotting, deposition percent vs D n where D is particle diffusion coefficient and n ranges from 0.5--0.66. 2 refs
International Nuclear Information System (INIS)
Leeuwenburgh, S.C.G.; Wolke, J.G.C.; Schoonman, J.; Jansen, J.A.
2005-01-01
In order to deposit biomedical calcium phosphate (CaP) coatings with a defined surface morphology, the electrostatic spray deposition (ESD) technique was used since this technique offers the possibility to deposit ceramic coatings with a variety of surface morphologies. A scanning electron microscopical study was performed in order to investigate the influence of several deposition parameters on the final morphology of the deposited coatings. The chemical characteristics of the coatings were studied by means of X-ray diffraction and Fourier-transform infrared spectroscopy. Regarding the chemical coating properties, the results showed that the coatings can be described as crystalline carbonate apatite coatings, a crystal phase which is similar to the mineral phase of bone and teeth. The morphology of CaP coatings, deposited using the ESD technique, was strongly dependent on the deposition parameters. By changing the nozzle-to-substrate distance, the precursor liquid flow rate and the deposition temperature, coating morphologies were deposited, which varied from dense to highly porous, reticular morphologies. The formation of various morphologies was the result of an equilibrium between the relative rates of CaP solute precipitation/reaction, solvent evaporation and droplet spreading onto the substrate surface
Estimation of illitization rate of smectite from the thermal history of Murakami deposit, Japan
International Nuclear Information System (INIS)
Kamei, G.; Arai, T.; Yusa, Y.; Sasaki, N.; Sakuramoto, Y.
1990-01-01
The research on illitization of smectite in the natural environment affords information on the long-term durability of bentonite which is the candidate for buffer material for high-level radioactive waste disposal facilities. Murakami bentonite deposit in central Japan, where the bentonite and rhyolitic intrusive rock were distributed, was surveyed and the lateral variation of smectite to illite in the aureole of the rhyolite was studied. The radiometric ages of some minerals from the intrusive rock and the clay deposit were determined. Comparison of the mineral ages with closure temperature estimated for the various isotopic systems allowed the thermal history of the area. The age of the intrusion was 7.1 ± 0.5 Ma, and the cooling rate of the intrusive rock was estimated to be approximately 45C/Ma. Sedimentation ages of the clay bed were mostly within the range from 18 to 14 Ma. However, the fission-track age of zircon in the clay containing illite/smectite mixed layers was 6.4 ± 0.4 Ma, which was close to that of the intrusion. The latter value could be explained as the result of annealing of fission-tracks in zircon. The presence of annealing phenomena and the estimated cooling rate concluded that illitization had occurred in the period of 3.4 Ma at least under the temperature range from above 240 ± 50 to 105C. Illite-smectite mixed layers occurred from smectite in the process. The proportion of illite was about 40%. Approximately, 29 kcal/mol as a value of activation energy was calculated to the illitization
Energy Technology Data Exchange (ETDEWEB)
Roro, K.T.; Botha, J.R.; Leitch, A.W.R. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa)
2008-07-01
ZnO thin films have been grown on glass substrates by MOCVD. The effect of deposition conditions such as VI/II molar ratio, DEZn flow rate and total reactor pressure on the growth rate and electrical properties of the films was studied. It is found that the growth rate decreases with an increase in the VI/II molar ratio. This behaviour is ascribed to the competitive adsorption of reactant species on the growth surface. The growth rate increases with an increase in DEZn flow rate, as expected. It is shown that the carrier concentration is independent of the DEZn flow rate. An increase in the total reactor pressure yields a decrease in growth rate. This phenomenon is attributed to the depletion of the gas phase due to parasitic prereactions between zinc and oxygen species at high pressure. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
Lee, J.; Kim, J.; Kang, H.
2017-12-01
Recently, extreme nitrogen(N) deposition events are observed in Arctic regions where over 90% of the annual N deposition occurred in just a few days. Since Arctic ecosystems are typically N-limited, input of extremely high amount of N could substantially affect ecosystem processes. CH4 is a potent greenhouse gas that has 25 times greater global warming potential than CO2 over a 100-year time frame. Ammonium is known as an inhibitor of methane oxidation and nitrate also shows inhibitory effect on it in temperate ecosystems. However, effects of N addition on Arctic ecosystems are still elusive. We conducted a lab-scale incubation experiment with moist acidic tundra (MAT) soil from Council, Alaska to investigate the effect of extreme N deposition events on methane oxidation. Zero point five % methane was added to the head space to determine the potential methane oxidation rate of MAT soil. Three treatments (NH4NO3-AN, (NH4)2SO4-AS, KNO3-PN) were used to compare effects of ammonium, nitrate and salts. All treatments were added in 3 levels: 10μg N gd.w-1(10), 50μg N gd.w-1(50) and 100μg N gd.w-1(100). AN10 and AN50 increased methane oxidation rate 1.7, 6% respectively. However, AN100 shows -8.5% of inhibitory effect. In AS added samples, all 3 concentrations (AN10, AN50, AN100) stimulated methane oxidation rate with 4.7, 8.9, 4%, respectively. On the contrary, PN50 (-9%) and PN100 (-59.5%) exhibited a significant inhibitory effect. We also analyzed the microbial gene abundance and community structures of methane oxidizing bacteria using a DNA-based fingerprinting method (T-RFLP) Our study results suggest that NH4+ can stimulate methane oxidation in Arctic MAT soil, while NO3- can inhibit methane oxidation significantly.
International Nuclear Information System (INIS)
Liu, Yue; Williams, Mackenzie G.; Miller, Timothy J.; Teplyakov, Andrew V.
2016-01-01
This paper establishes a strategy for chemical deposition of functionalized nanoparticles onto solid substrates in a layer-by-layer process based on self-limiting surface chemical reactions leading to complete monolayer formation within the multilayer system without any additional intermediate layers — nanoparticle layer deposition (NPLD). This approach is fundamentally different from previously established traditional layer-by-layer deposition techniques and is conceptually more similar to well-known atomic and molecular layer deposition processes. The NPLD approach uses efficient chemical functionalization of the solid substrate material and complementary functionalization of nanoparticles to produce a nearly 100% coverage of these nanoparticles with the use of “click chemistry”. Following this initial deposition, a second complete monolayer of nanoparticles is deposited using a copper-catalyzed “click reaction” with the azide-terminated silica nanoparticles of a different size. This layer-by-layer growth is demonstrated to produce stable covalently-bound multilayers of nearly perfect structure over macroscopic solid substrates. The formation of stable covalent bonds is confirmed spectroscopically and the stability of the multilayers produced is tested by sonication in a variety of common solvents. The 1-, 2- and 3-layer structures are interrogated by electron microscopy and atomic force microscopy and the thickness of the multilayers formed is fully consistent with that expected for highly efficient monolayer formation with each cycle of growth. This approach can be extended to include a variety of materials deposited in a predesigned sequence on different substrates with a highly conformal filling. - Highlights: • We investigate the formation of high-coverage monolayers of nanoparticles. • We use “click chemistry” to form these monolayers. • We form multiple layers based on the same strategy. • We confirm the formation of covalent bonds
International Nuclear Information System (INIS)
Kushner, M.J.; Anderson, H.M.; Hargis, P.J.
1985-01-01
In low pressure, radio frequency (RF) discharges of the type used in plasma processing of semiconductor materials, the rate of electron impact excitation and energy transfer processes depends upon both the phase of the RF excitation and position in the discharge. Electron impact collisions create radicals that diffuse or drift to the surfaces of interest where they are adsorbed or otherwise react. To the extent that these radicals have a finite lifetime, their transport time from point of creation to surface of interest is an important parameter. The spatial dependence of the rate of the initial electron impact collisions is therefore also an important parameter. The power that sustains the discharge is coupled into the system by two mechanisms: a high energy e-beam component of the electron distribution resulting from electrons falling through or being accelerated by the sheaths, and by joule heating in the body of the plasma. In this paper, the authors discuss the spatial dependence of excitation rates and the method of power deposition iin RF discharges of the type used for plasma processing
Directory of Open Access Journals (Sweden)
Viola Pavlova
Full Text Available Climate change will increasingly affect the natural habitat and diet of polar bears (Ursus maritimus. Understanding the energetic needs of polar bears is therefore important. We developed a theoretical method for estimating polar bear food consumption based on using the highly recalcitrant polychlorinated biphenyl (PCB congener, 2,2',4,4',55-hexaCB (CB153 in bear adipose tissue as an indicator of food intake. By comparing the CB153 tissue concentrations in wild polar bears with estimates from a purposely designed individual-based model, we identified the possible combinations of field metabolic rates (FMR and CB153 deposition efficiencies in East Greenland polar bears. Our simulations indicate that if 30% of the CB153 consumed by polar bear individuals were deposited into their adipose tissue, the corresponding FMR would be only two times the basal metabolic rate. In contrast, if the modelled CB153 deposition efficiency were 10%, adult polar bears would require six times more energy than that needed to cover basal metabolism. This is considerably higher than what has been assumed for polar bears in previous studies though it is similar to FMRs found in other marine mammals. An implication of this result is that even relatively small reductions in future feeding opportunities could impact the survival of East Greenland polar bears.
Energy Technology Data Exchange (ETDEWEB)
Selvamanickam, V.; Lee, H.G.; Li, Y.; Xiong, X.; Qiao, Y.; Reeves, J.; Xie, Y.; Knoll, A.; Lenseth, K
2003-10-15
SuperPower has been scaling up YBa{sub 2}Cu{sub 3}O{sub x}-based second-generation superconducting tapes by techniques such as pulsed laser deposition (PLD) using industrial laser and metal organic chemical vapor deposition (MOCVD). Both techniques offer advantage of high deposition rates, which is important for high throughput. Using highly-polished substrates produced in a reel-to-reel polishing facility and buffer layers deposited in a pilot ion beam assisted deposition facility, meter-long second-generation high temperature superconductor tapes have been produced. 100 A class, meter-long coated conductor tapes have been reproducibly demonstrated in this work by both MOCVD and PLD. The best results to date are 148 A over 1.06 m by MOCVD and 135 A over 1.1 m by PLD using industrial laser.
International Nuclear Information System (INIS)
Darwich, R.
2009-07-01
The goal of this work is to study the properties of the defects aiming to explore the types of defects and the effect of various deposition parameters such as substrate temperature, the kind of the substrate, gas pressure and deposition rate. Two kinds of samples have been used; The first one was a series of Schottky diodes, and the second one a series of solar cells (p-i-n junction) deposited on crystalline silicon or on corning glass substrates with different deposition parameters. The deposition parameters were chosen to obtain materials whose their structures varying from amorphous to microcrystalline silicon including polymorphous silicon. Our results show that the polymorphous silicon samples deposited at high deposition rates present the best photovoltaic properties in comparison with those deposited at low rates. Also we found that the defects concentration in high deposition rate samples is less at least by two orders than that obtained in low deposition rate polymorphous, microcrystalline and amorphous samples. This study shows also that there is no effect of the substrate, or the thin films of highly doped amorphous silicon deposited on the substrate, on the creation and properties of these defects. Finally, different experimental methods have been used; a comparison between their results has been presented. (author)
A marine biogeochemical perspective on black shale deposition
Piper, D. Z.; Calvert, S. E.
2009-06-01
Deposition of marine black shales has commonly been interpreted as having involved a high level of marine phytoplankton production that promoted high settling rates of organic matter through the water column and high burial fluxes on the seafloor or anoxic (sulfidic) water-column conditions that led to high levels of preservation of deposited organic matter, or a combination of the two processes. Here we review the hydrography and the budgets of trace metals and phytoplankton nutrients in two modern marine basins that have permanently anoxic bottom waters. This information is then used to hindcast the hydrography and biogeochemical conditions of deposition of a black shale of Late Jurassic age (the Kimmeridge Clay Formation, Yorkshire, England) from its trace metal and organic carbon content. Comparison of the modern and Jurassic sediment compositions reveals that the rate of photic zone primary productivity in the Kimmeridge Sea, based on the accumulation rate of the marine fraction of Ni, was as high as 840 g organic carbon m - 2 yr -1. This high level was possibly tied to the maximum rise of sea level during the Late Jurassic that flooded this and other continents sufficiently to allow major open-ocean boundary currents to penetrate into epeiric seas. Sites of intense upwelling of nutrient-enriched seawater would have been transferred from the continental margins, their present location, onto the continents. This global flooding event was likely responsible for deposition of organic matter-enriched sediments in other marine basins of this age, several of which today host major petroleum source rocks. Bottom-water redox conditions in the Kimmeridge Sea, deduced from the V:Mo ratio in the marine fraction of the Kimmeridge Clay Formation, varied from oxic to anoxic, but were predominantly suboxic, or denitrifying. A high settling flux of organic matter, a result of the high primary productivity, supported a high rate of bacterial respiration that led to the
Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering
International Nuclear Information System (INIS)
Horstmann, F.; Sittinger, V.; Szyszka, B.
2009-01-01
In this study, indium tin oxide (ITO) films were prepared by high power pulse magnetron sputtering [D. J. Christie, F. Tomasel, W. D. Sproul, D. C. Carter, J. Vac. Sci. Technol. A, 22 (2004) 1415. ] without substrate heating. The ITO films were deposited from a ceramic target at a deposition rate of approx. 5.5 nm*m/min kW. Afterwards, the ITO films were covered with a siliconoxynitride film sputtered from a silicon alloy target in order to prevent oxidation of the ITO film during annealing at 650 deg. C for 10 min in air. The optical and electrical properties as well as the texture and morphology of these films were investigated before and after annealing. Mechanical durability of the annealed films was evaluated at different test conditions. The results were compared with state-of-the art ITO films which were obtained at optimized direct current magnetron sputtering conditions
Chen, Chia-Ying; Shih, Zih-Yu; Yang, Zusing; Chang, Huan-Tsung
2012-10-01
We have prepared carbon nanotube (CNT)/cobalt sulfide (CoS) composites from cobalt nitrate, thioacetamide, and CNTs in the presence of poly(vinylpyrrolidone). CNT/CoS composites are deposited onto fluorine-doped tin oxide glass substrates and then subjected to simple annealing at 300 °C for 0.5 h to fabricate CNT/CoS electrodes. Data collected from Raman spectroscopy, X-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, and d-spacing reveal the changes in the CoS structures and crystalline lattices after annealing. Cyclic voltammetry results reveal that the annealed CNT/CoS composite electrodes yield values of 2140 ± 90 and 1370 ± 50 F g-1 for specific capacitance at scan rates of 10 and 100 mV s-1, respectively. To the best of our knowledge, the annealed CNT/CoS composite electrodes provide higher specific capacitance relative to other reported ones at a scan rate of 100 mV s-1. CNT/CoS composite electrodes yield a power density of 62.4 kW kg-1 at a constant discharge current density of 217.4 A g-1. With such a high-rate capacity and power density, CNT/CoS composite supercapacitors demonstrate great potential as efficient energy storage devices.
International Nuclear Information System (INIS)
Peng, Shou; Yang, Yong; Li, Gang; Jiang, Jiwen; Jin, Kewu; Yao, TingTing; Zhang, Kuanxiang; Cao, Xin; Wang, Yun; Xu, Genbao
2016-01-01
N doped TiO_2 films were deposited on glass substrates at room temperature using DC coupled RF magnetron sputtering with a TiO_2 ceramic target. The influences of N_2 flow rate on the deposition rate, crystal structure, chemical composition and band gap of the deposited films were investigated by Optical profiler, X-ray diffraction, X-ray photoelectron spectroscope and ultraviolet-visible spectrophotometer. The film growth rate gradually decreased with increasing N_2 flow rate. As N_2 flow rate increased, the crystallization of the films deteriorated, and the films tended to form amorphous structure. XPS analysis revealed that N dopant atoms were added at the substitutional sites into TiO_2 lattice structure. FE-SEM results showed that the grain size of the film decreased and the crystallinity degraded as N_2 flow rate increases. In addition, N doping caused an obvious red shift in the optical absorption edge. - Highlights: • N doped TiO_2 films were deposited by DC coupled RF magnetron reactive sputtering. • As N_2 flow rate increases, the crystallization of the deposited films degrades. • The higher N_2 flow rate is beneficial to form more substituted N in the film. • N doping causes an obvious red shift in the absorption wavelength.
International Nuclear Information System (INIS)
Ghaderi, Mohammad Reza; Eslampanah, Amirhossein; Ghaderi, Kianoosh; Aghakhani, Masood
2015-01-01
We used a novel optimization algorithm based on the imperialist competitive algorithm (ICA) to optimize the deposition rate in the submerged arc welding (SAW) process. This algorithm offers some advantages such as simplicity, accuracy and time saving. Experiments were conducted based on a five factor, five level rotatable central composite design (RCCD) to collect welding data for deposition rate as a function of welding current, arc voltage, contact tip to plate distance, welding speed and thickness of TiO 2 nanoparticles coated on the plates of mild steel. Furthermore, regression equation for deposition rate was obtained using least squares method. The regression equation as the cost function was optimized using ICA. Ultimately, the levels of input variables to achieve maximum deposition rate were obtained using ICA. Computational results indicate that the proposed algorithm is quite effective and powerful in optimizing the cost function.
Electrochemical deposition of coatings of highly entropic alloys from non-aqueous solutions
Directory of Open Access Journals (Sweden)
Jeníček V.
2016-03-01
Full Text Available The paper deals with electrochemical deposition of coatings of highly entropic alloys. These relatively new materials have been recently intensively studied. The paper describes the first results of electrochemical coating with highly entropic alloys by deposition from non-aqueous solutions. An electrochemical device was designed and coatings were deposited. The coatings were characterised with electronic microscopy scanning, atomic absorption spectrometry and X-ray diffraction methods and the combination of methods of thermic analysis of differential scanning calorimetry and thermogravimetry.
Effect of high temperature deposition on CoSi2 phase formation
International Nuclear Information System (INIS)
Comrie, C. M.; Ahmed, H.; Smeets, D.; Demeulemeester, J.; Vantomme, A.; Turner, S.; Van Tendeloo, G.; Detavernier, C.
2013-01-01
This paper discusses the nucleation behaviour of the CoSi to CoSi 2 transformation from cobalt silicide thin films grown by deposition at elevated substrate temperatures ranging from 375 °C to 600 °C. A combination of channelling, real-time Rutherford backscattering spectrometry, real-time x-ray diffraction, and transmission electron microscopy was used to investigate the effect of the deposition temperature on the subsequent formation temperature of CoSi 2 , its growth behaviour, and the epitaxial quality of the CoSi 2 thus formed. The temperature at which deposition took place was observed to exert a significant and systematic influence on both the formation temperature of CoSi 2 and its growth mechanism. CoSi films grown at the lowest temperatures were found to increase the CoSi 2 nucleation temperature above that of CoSi 2 grown by conventional solid phase reaction, whereas the higher deposition temperatures reduced the nucleation temperature significantly. In addition, a systematic change in growth mechanism of the subsequent CoSi 2 growth occurs as a function of deposition temperature. First, the CoSi 2 growth rate from films grown at the lower reactive deposition temperatures is substantially lower than that grown at higher reactive deposition temperatures, even though the onset of growth occurs at a higher temperature, Second, for deposition temperatures below 450 °C, the growth appears columnar, indicating nucleation controlled growth. Elevated deposition temperatures, on the other hand, render the CoSi 2 formation process layer-by-layer which indicates enhanced nucleation of the CoSi 2 and diffusion controlled growth. Our results further indicate that this observed trend is most likely related to stress and changes in microstructure introduced during reactive deposition of the CoSi film. The deposition temperature therefore provides a handle to tune the CoSi 2 growth mechanism.
Energy Technology Data Exchange (ETDEWEB)
Kinoshita, M; Saito, A [Toyota Central Research and Development Labs., Inc., Aichi (Japan); Matsushita, S [Toyota Motor Corp., Aichi (Japan); Shibata, H [Nippon Soken, Inc., Tokyo (Japan); Niwa, Y [Denso Corp., Aichi (Japan)
1997-10-01
Nozzles in fuel injectors for direct injection gasoline engines are exposed to high temperature combustion gases and soot. In such a rigorous environment, it is a fear that fuel flow rate changes in injectors by deposit formation on nozzles. Fundamental factors of nozzle deposit formation were investigated through injector bench tests and engine dynamometer tests. Deposit formation processes were observed by SEM through engine dynamometer tests. The investigation results reveal nozzle deposit formation mechanism and how to suppress the deposit. 4 refs., 8 figs., 3 tabs.
The Influence of Cultivation System on Distribution Profile Of 137cs and Erosion / Deposition Rate
Directory of Open Access Journals (Sweden)
Nita Suhartini
2016-05-01
Full Text Available 137Cs radiogenic content in the soil can be used to estimate the rate of erosion and deposition in an area occurring since 1950’s, by comparing the content of the 137Cs in observed site with those in a stable reference site. This experiment aimed to investigate the influence of cultivation type on distribution profile of 137Cs and distribution of erosion and deposition rate in cultivated area. A study site was small cultivated area with slope steepness <10o and length 2 km located in Bojong – Ciawi. For this purpose, the top of a slope was chosen for reference site and three plot sites were selected namely Land Use I that using simple cultivation, Land Use II that using simple cultivation with ridge and furrow, and Land Use III using machine cultivation. The results showed that cultivation could make a movement of 137Cs to the deeper layer and ridges and furrows cultivation system could minimized an erosion process. The net erosion and deposition for land Use I, II and III were -25 t/ha/yr , 24 t/ha/yr and -58 t/ha/yr, respectively.
Industrial high-rate (~14 nm/s) deposition of low resistive and transparent ZnOx:Al films on glass
Illiberi, A.; Kniknie, B.; Deelen, J. van; Steijvers, H.L.A.H.; Habets, D.; Simons, P.J.P.M.; Janssen, A.C.; Beckers, E.H.A.
2011-01-01
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. Tertiary-butanol has been used as oxidant for diethylzinc and trimethylaluminium as dopant gas. ZnOx:Al films can be
Amorphous carbon nanofibres inducing high specific capacitance of deposited hydrous ruthenium oxide
International Nuclear Information System (INIS)
Barranco, V.; Pico, F.; Ibanez, J.; Lillo-Rodenas, M.A.; Linares-Solano, A.; Kimura, M.; Oya, A.; Rojas, R.M.; Amarilla, J.M.; Rojo, J.M.
2009-01-01
Composites consisting of ruthenium oxide particles deposited on amorphous carbon nanofibres are prepared by a repetitive impregnation procedure. The choice of amorphous carbon nanofibres as support of amorphous ruthenium oxide leads to composites in which the deposited oxide consists of aggregates of extremely small primary particles (1-1.5 nm-size) and showing high porosity (specific surface area of 450 m 2 g -1 ). This special deposition of the oxide seems to favour: (i) high oxide capacitance (1000 Fg -1 ) at high oxide loadings (up to 20 wt%) and (ii) high capacitance retention (ca. 80% from the initial oxide capacitance) at high current densities (200 mA cm -2 ). Amorphous carbon nanofibres are suitable supports for amorphous ruthenium oxide and perhaps for other amorphous oxides acting as active electrode materials.
International Nuclear Information System (INIS)
Cao Zongze; Yang Yuhua; Lu, Julia; Zhang Chengxiao
2011-01-01
Physical characterization and chemical analysis of settled dusts collected in Xi'an from November 2007 to December 2008 show that (1) dust deposition rates ranged from 14.6 to 350.4 g m -2 yr -1 . The average deposition rate (76.7 g m -2 yr -1 ) ranks the 11th out of 56 dust deposition rates observed throughout the world. The coal-burning power was the major particle source; (2) on average (except site 4), ∼10% of the settled dusts having size 70% having size <30 μm; (3) the concentrations for 20 out of 27 elements analyzed were upto 18 times higher than their soil background values in China. With such high deposition rates of dusts that contain elevated levels of toxic elements, actions should be taken to reduce emission and studies are needed to assess the potential impacts of settled particles on surface ecosystem, water resource, and human health in the area. - Research highlights: → High atmospheric dust deposition rate in Xi'an, Shaanxi, China. → Coal-burning power plan being a major source of particulate matter in Xi'an area. → High levels of toxic elements in the settled dusts. → Enrichment of heavy metals (e.g., Pb, Ni, Cu) in fine particles. - Atmospheric dust deposition rate is high and the levels of toxic elements associated with the settled dusts are elevated in Xi'an, Shaanxi, China.
Cao, X. Y.; Zhu, P.; Yong, Q.; Liu, T. G.; Lu, Y. H.; Zhao, J. C.; Jiang, Y.; Shoji, T.
2018-02-01
Effect of tempering on low cycle fatigue (LCF) behaviors of nuclear-grade deposited weld metal was investigated, and The LCF tests were performed at 350 °C with strain amplitudes ranging from 0.2% to 0.6%. The results showed that at a low strain amplitude, deposited weld metal tempered for 1 h had a high fatigue resistance due to high yield strength, while at a high strain amplitude, the one tempered for 24 h had a superior fatigue resistance due to high ductility. Deposited weld metal tempered for 1 h exhibited cyclic hardening at the tested strain amplitudes. Deposited weld metal tempered for 24 h exhibited cyclic hardening at a low strain amplitude but cyclic softening at a high strain amplitude. Existence and decomposition of martensite-austenite (M-A) islands as well as dislocations activities contributed to fatigue property discrepancy among the two tempered deposited weld metal.
Yuqing, XIONG; Hengjiao, GAO; Ni, REN; Zhongwei, LIU
2018-03-01
Copper thin films were deposited by plasma-enhanced atomic layer deposition at low temperature, using copper(I)-N,N‧-di-sec-butylacetamidinate as a precursor and hydrogen as a reductive gas. The influence of temperature, plasma power, mode of plasma, and pulse time, on the deposition rate of copper thin film, the purity of the film and the step coverage were studied. The feasibility of copper film deposition on the inner wall of a carbon fibre reinforced plastic waveguide with high aspect ratio was also studied. The morphology and composition of the thin film were studied by atomic force microscopy and x-ray photoelectron spectroscopy, respectively. The square resistance of the thin film was also tested by a four-probe technique. On the basis of on-line diagnosis, a growth mechanism of copper thin film was put forward, and it was considered that surface functional group played an important role in the process of nucleation and in determining the properties of thin films. A high density of plasma and high free-radical content were helpful for the deposition of copper thin films.
International Nuclear Information System (INIS)
Makino, Hisao; Song, Huaping; Yamamoto, Tetsuya
2014-01-01
The Ga-doped ZnO (GZO) films deposited on glass and c-plane sapphire substrates have been comparatively studied in order to explore the role of grain boundaries in electrical properties. The influences of oxygen gas flow rates (OFRs) during the deposition by ion-plating were examined. The dependences of carrier concentration, lattice parameters, and characteristic of thermal desorption of Zn on the OFR showed common features between glass and sapphire substrates, however, the Hall mobility showed different behavior. The Hall mobility of GZO films on glass increased with increasing OFR of up to 15 sccm, and decreased with further increasing OFR. On the other hand, the Hall mobility of GZO films on c-sapphire increased for up to 25 sccm. The role of grain boundary in polycrystalline GZO films has been discussed. - Highlights: • Ga-doped ZnO films were deposited on glass and c-sapphire by ion-plating. • The epitaxial growth on c-sapphire was confirmed by X-ray diffraction. • Dependence of Hall mobility showed different tendency between glass and sapphire. • Grain boundaries influence transport properties at high O 2 gas flow rate
Effect of oxygen flow rate on ITO thin films deposited by facing targets sputtering
International Nuclear Information System (INIS)
Kim, Youn J.; Jin, Su B.; Kim, Sung I.; Choi, Yoon S.; Choi, In S.; Han, Jeon G.
2010-01-01
Tin-doped indium oxide (ITO) thin films were deposited on glass substrates at various oxygen flow rates using a planar magnetron sputtering system with facing targets. In this system, the strong internal magnets inside the target holders confine the plasma between the targets. High resolution transmission electron microscopy revealed a combination of amorphous and crystalline phases on the glass substrate. X-ray photoelectron spectroscopy suggested that the decrease in carrier concentration and increase in mobility were caused by a decrease in the concentration of Sn 4+ states. The electrical and optical properties of the ITO films were examined by Hall measurements and UV-visible spectroscopy, which showed a film resistivity and transmittance of 4.26 x l0 -4 Ω cm, and > 80% in the visible region, respectively.
International Nuclear Information System (INIS)
Calnan, Sonya; Upadhyaya, Hari M.; Dann, Sandra E.; Thwaites, Mike J.; Tiwari, Ayodhya N.
2007-01-01
Indium tin oxide (ITO) films were deposited by reactive High Target Utilisation Sputtering (HiTUS) onto glass and polyimide substrates. The ion plasma was generated by an RF power source while the target bias voltage was varied from 300 V to 500 V using a separate DC power supply. The deposition rate, at constant target power, increased with DC target voltage due to increased ion energy reaching 34 nm/min at 500 V. All the films were polycrystalline and showed strong (400) and (222) reflections with the relative strength of latter increasing with target bias voltage. The resistivity was lowest at 500 V with values of 1.8 x 10 -4 Ω cm and 2.4 x 10 -4 Ω cm on glass and polyimide, respectively but was still less than 5 x 10 -4 Ω cm at 400 V. All films were highly transparent to visible light, (> 80%) but the NIR transmittance decreased with increasing target voltage due to higher free carrier absorption. Therefore, ITO films can be deposited onto semiconductor layers such as in solar cells, with minimal ion damage while maintaining low resistivity
Deposition Rate and Energy Enhancements of TiN Thin-Film in a Magnetized Sheet Plasma Source
Hamdi Muhyuddin D. Barra; Henry J. Ramos
2011-01-01
Titanium nitride (TiN) has been synthesized using the sheet plasma negative ion source (SPNIS). The parameters used for its effective synthesis has been determined from previous experiments and studies. In this study, further enhancement of the deposition rate of TiN synthesis and advancement of the SPNIS operation is presented. This is primarily achieved by the addition of Sm-Co permanent magnets and a modification of the configuration in the TiN deposition process. The ...
Effect of PbI2 deposition rate on two-step PVD/CVD all-vacuum prepared perovskite
International Nuclear Information System (INIS)
Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos
2016-01-01
In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI 2 and chemical vapour deposition (CVD) of CH 3 NH 3 I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI 2 film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH 3 NH 3 I is fostered for PbI 2 films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI 2 on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH 3 NCH 3 molecules been fostered by increasing the PVD rate of PbI 2 and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI 2 (001) crystallite planes. • CH 3 NH 3 I intercalation process fostered by increased PbI 2 PVD rate. • Stoichiometric CH 3 NH 3 PbI 3 suitable as absorber in photovoltaic applications • Reduced PbI 2 residue at the bottom of CH 3 NH 3 PbI 3 improves device performance.
DEFF Research Database (Denmark)
Bordo, K.; Rubahn, H. G.
2012-01-01
Aluminum (Al) films with thickness of 100 nm were grown on unheated glass, silicon and mica substrates by electron beam evaporation. The deposition rates were adjusted in the range between 0.1 nm/s and 2 nm/s, the pressure in the vacuum chamber during deposition was lower than 1.10(-3) Pa. The st...
Electron beam deposition system causing little damage to organic layers
Energy Technology Data Exchange (ETDEWEB)
Yamada, Minoru [Research Center for Solar Energy Chemistry, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531 (Japan); Business Incubation Department, Hitachi Zosen Corporation, 2-11 Funamachi 2-Chome, Taisho-ku, Osaka 551-0022 (Japan); Matsumura, Michio, E-mail: matsu@chem.es.osaka-u.ac.jp [Research Center for Solar Energy Chemistry, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531 (Japan); Maeda, Yasuhiro [Business Incubation Department, Hitachi Zosen Corporation, 2-11 Funamachi 2-Chome, Taisho-ku, Osaka 551-0022 (Japan)
2011-07-29
Conditions for deposition of an aluminum (Al) layer on an organic light-emitting layer with an electron beam (EB) deposition system were optimized with respect to deposition rate and damage to organic layers. The damage to the organic layers was found to be mostly caused by X-rays emitted from a target bombarded with accelerated electrons. In order to decrease the X-ray intensity while maintaining a high deposition rate, we used an EB source which emits high-density EB at low acceleration voltage. In addition, we inserted a heat reflector and a sintered-carbon liner between the Al target and copper crucible to improve heat insulation. As a result, the voltage needed for the deposition of Al electrodes at a rate of about 8 nm/s was lowered from normal voltages of 2.0 kV or higher to as low as 1.5 kV. To reduce the number of electrons hitting the substrate, we set pole pieces near the target and an electron trap in the chamber. The devices on which Al electrodes were deposited with the EB system showed almost the same properties as those of devices on which the Al electrodes were deposited by a resistive-heating method.
Modelling Measured Deposition and Resuspension Rates of Particles in Animal Buildings
DEFF Research Database (Denmark)
Lengweiler, P.; Moser, A.; Nielsen, Peter V.
on the surfaces is shown as a function of time. High contents of organic dust in animal buildings can affect the health of both people and animals. Deposition on indoor surfaces is an important removal mechanism to reduce the airborne particle concentration. As a basis to develop methods to eliminate dust related...
Massive accumulation of highly polluted sedimentary deposits by river damming
Energy Technology Data Exchange (ETDEWEB)
Palanques, Albert, E-mail: albertp@icm.csic.es [Institute of Marine Sciences (CSIC), Passeig Maritim de la Barceloneta, 37-49, Barcelona 08003 (Spain); Grimalt, Joan [Institute of Environmental Assessment and Water Research (CSIC), Jordi Girona, 18, Barcelona 08034 (Spain); Belzunces, Marc; Estrada, Ferran; Puig, Pere; Guillén, Jorge [Institute of Marine Sciences (CSIC), Passeig Maritim de la Barceloneta, 37-49, Barcelona 08003 (Spain)
2014-11-01
Uncontrolled dumping of anthropogenic waste in rivers regulated by dams has created contaminated deposits in reservoirs that have remained unidentified for decades. The Flix Reservoir is located in the Ebro River, the second largest river flowing into the NW Mediterranean, has been affected by residue dumping from a chlor-alkali electrochemical plant for decades. High-resolution seismic profiles, bathymetric data, surficial sediment samples and sediment cores were obtained in the Flix Reservoir to study the characteristics of the deposit accumulated by this dumping. These data were used to reconstruct the waste deposit history. Since the construction of the Flix Dam in 1948, more than 3.6 × 10{sup 5} t of industrial waste has accumulated in the reservoir generating a delta-like deposit formed by three sediment lobes of fine-grained material highly contaminated by Hg, Cd, Zn and Cr (max: 640, 26, 420 and 750 mg kg{sup −1}, respectively). This contamination was associated with the Hg that was used for the cathode in the electrochemical plant from 1949 and with the production of phosphorite derivatives from 1973. After the construction of two large dams only a few kilometres upstream during the 1960s, the solids discharged from the industrial complex became the main sediment source to the Flix Reservoir. The deposit has remained in the reservoir forming a delta that obstructs about 50% of the river water section. Its stability only depended on the flow retention by the Flix Dam. At present, this contaminated waste deposit is being removed from the water reservoir as it is a cause of concern for the environment and for human health downriver. - Highlights: • A delta-like anthropogenic deposit prograded into the reservoir behind the Flix dam. • More than 3.6 × 10{sup 5} t of anthropogenic waste was accumulated in less than 4 decades. • A waste deposit with extreme levels of Hg and Cd was trapped in the Flix Reservoir. • The main pollution was related to
Electrospark deposition for die repair
Directory of Open Access Journals (Sweden)
J. Tušek
2012-01-01
Full Text Available The electrospark deposition is a process for surfacing of hard metal alloys, e.g. carbides and stellites, on the surfaces of new or old machine elements. In this process, a high current is conducted through an oscillating electrode and a substrate for a very short period of time. In the paper, the process is described and the thickness of deposited layer, chemical composition, dilution rate and the layer roughness are determined.
Mobility Optimization in LaxBa1-xSnO3 Thin Films Deposited via High Pressure Oxygen Sputtering
Postiglione, William Michael
BaSnO3 (BSO) is one of the most promising semiconducting oxides currently being explored for use in future electronic applications. BSO possesses a unique combination of high room temperature mobility (even at very high carrier concentrations, > 1019 cm-3), wide band gap, and high temperature stability, making it a potentially useful material for myriad applications. Significant challenges remain however in optimizing the properties and processing of epitaxial BSO, a critical step towards industrial applications. In this study we investigate the viability of using high pressure oxygen sputtering to produce high mobility La-doped BSO thin films. In the first part of our investigation we synthesized, using solid state reaction, phase-pure stoichiometric polycrystalline 2% La-doped BaSnO 3 for use as a target material in our sputtering system. We verified the experimental bulk lattice constant, 4.117 A, to be in good agreement with literature values. Next, we set out to optimize the growth conditions for DC sputtering of La doped BaSnO3. We found that mobility for all our films increased monotonically with deposition temperature, suggesting the optimum temperature for deposition is > 900 °C and implicating a likely improvement in transport properties with post-growth thermal anneal. We then preformed systematic studies aimed at probing the effects of varying thickness and deposition rate to optimize the structural and electronic transport properties in unbuffered BSO films. In this report we demonstrate the ability to grow 2% La BSO thin films with an effective dopant activation of essentially 100%. Our films showed fully relaxed (bulk), out-of-plane lattice parameter values when deposited on LaAlO3, MgO, and (LaAlO3)0.3(Sr2 TaAlO6)0.7 substrates, and slightly expanded out-of-plane lattice parameters for films deposited on SrTiO3, GdScO3, and PrScO3 substrates. The surface roughness's of our films were measured via AFM, and determined to be on the nm scale or better
Horita, Susumu; Jain, Puneet
2017-08-01
A low-temperature silcon oxide film was deposited at 160 to 220 °C using an atmospheric pressure CVD system with silicone oil vapor and ozone gases. It was found that the deposition rate is markedly increased by adding trichloroethylene (TCE) vapor, which is generated by bubbling TCE solution with N2 gas flow. The increase is more than 3 times that observed without TCE, and any contamination due to TCE is hardly observed in the deposited Si oxide films from Fourier transform infrared spectra.
International Nuclear Information System (INIS)
Zhang, G.F.; Zheng, X.; Guo, L.J.; Liu, Z.T.; Xiu, N.K.
1994-01-01
In order to use diamond-like carbon (DLC) films as protective and antireflection coatings for IR optical materials exposed to hostile environments, an investigation has been systematically conducted on the influence of the deposition parameters on the refractive index and growth rate of DLC films, which are two of the most important parameters in evaluating optical characteristics of antireflection coatings. The experimental results show that both the refractive index and growth rate of DLC films depend strongly on the negative d.c. bias voltage. The refractive index increases with increasing bias voltage and decreases with increasing partial pressure of the hydrocarbon gas and total flow rate of the mixture. The growth rate increases greatly when the bias voltage is larger than a threshold value. The various parameters which influence the structure and properties of DLC films are interrelated. Fourier transform IR spectroscopy results show that the strength of the C-H stretching absorption band in the range 3300-2850 cm -1 is gradually weakened with increasing negative bias voltage and argon concentration. High energy bombardment of the growing film plays an important role in the structure and hence the properties of DLC films. (orig.)
Grave, Daniel A.
Gadolinium oxide (Gd2O3) is an attractive material for solid state neutron detection due to gadolinium's high thermal neutron capture cross section. Development of neutron detectors based on Gd2 O3 requires sufficiently thick films to ensure neutron absorption. In this dissertation work, the process-structure-property relationships of micron thick Gd2O3 films deposited by reactive electron-beam physical vapor deposition (EB-PVD) were studied. Through a systematic design of experiments, fundamental studies were conducted to determine the effects of processing conditions such as deposition temperature, oxygen flow rate, deposition rate, and substrate material on Gd2O3 film crystallographic phase, texture, morphology, grain size, density, and surface roughness. Films deposited at high rates (> 5 A/s) were examined via x-ray diffraction (XRD) and Raman spectroscopy. Quantitative phase volume calculations were performed via a Rietveld refinement technique. All films deposited at high rates were found to be fully monoclinic or mixed cubic/monoclinic phase. Generally, increased deposition temperature and increased oxygen flow resulted in increased cubic phase volume. As film thickness increased, monoclinic phase volume increased. Grazing incidence x-ray diffraction (GIXRD) depth profiling analysis showed that cubic phase was only present under large incidence angle (large penetration depth) measurements, and after a certain point, only monoclinic phase was grown. This was confirmed by transmission electron microscopy (TEM) analysis with selected area diffraction (SAD). Based on this information, a large compressive stress was hypothesized to cause the formation of the monoclinic phase and this hypothesis was confirmed by demonstrating the existence of a stress induced phase transition. An experiment was designed to introduce compressive stress into the Gd2O 3 films via ion beam assisted deposition (IBAD). This allowed for systematic increase in compressive stress while
Energy Technology Data Exchange (ETDEWEB)
Zhao, Xiaoli; Jin, Jie [Tianjin University, School of Electronic Information Engineering, Tianjin (China); Cheng, Jui-Ching, E-mail: juiching@ntut.edu.tw [Chang-Gung University, Department of Electronics, Taoyuan, Taiwan (China); Lee, Jyh-Wei [Ming Chi University of Technology, College of Materials Engineering, New Taipei City, Taiwan (China); Wu, Kuo-Hong [Chang-Gung University, Department of Electronics, Taoyuan, Taiwan (China); Lin, Kuo-Cheng; Tsai, Jung-Ruey [Asia University, Department of Photonics and Communication Engineering, Taichung, Taiwan (China); Liu, Kou-Chen, E-mail: jacobliu@mail.cgu.edu.tw [Chang-Gung University, Department of Electronics, Taoyuan, Taiwan (China)
2014-11-03
Zirconia films are deposited by reactive high power impulse magnetron sputtering (HiPIMS) technology on glass and indium-tin-oxide (ITO)/glass substrates. Preparation, microstructure and optical characteristics of the films have been studied. During deposition, the influence of the target power and duty cycle on the peak current–voltage and power density has been observed in oxide mode. Transparent thin films under different oxygen proportions are obtained on the two substrates. Atomic force microscopy measurements showed that the surface roughness of the films was lower by reactive HiPIMS than DC sputtering for all oxygen contents. The transmission and reflectance properties of differently grown zirconia films were also investigated using an ultraviolet–visible spectrophotometer. The optical transmittance of films grown on glass substrates by HiPIMS reached maximum values above 90%, which exceeded that by DC sputtering. The band edge near 5.86 eV shifted to a lower wavelength for zirconia films prepared with oxygen flow rates lower than 4.5 sccm. For the films prepared on ITO/glass substrates, the transmittance and the band gap of zirconia films were limited by ITO films; a maximum average transmittance of 84% was obtained at 4.5 sccm O{sub 2} and the energy band gap was in the range of 3.7–3.8 eV for oxygen flow rates ranging from 3.5 to 5.0 sccm. Finally, the electrical properties of zirconia films have also been discussed. - Highlights: • Zirconia films are deposited by reactive high power impulse magnetron sputtering. • Low roughness films are obtained. • Films show a high transmittance (> 90%). • Films prepared on glass have a band gap of 5.9 eV.
Atmospheric nitrogen deposition influences denitrification and nitrous oxide production in lakes.
McCrackin, Michelle L; Elser, James J
2010-02-01
Microbially mediated denitrification is an important process that may ameliorate the effects of nitrogen (N) loading by permanently removing excess N inputs. In this study, we measured the rate of denitrification and nitrous oxide (N2O) production during denitrification in sediments from 32 Norwegian lakes at the high and low ends of a gradient of atmospheric N deposition. Denitrification and N2O production rates averaged 41.7 and 1.1 micromol N x m(-2) x h(-1), respectively, for high-deposition lakes. There was no detectable denitrification or N2O production in low-deposition lakes. Epilimnetic nitrate concentration was strongly correlated with denitrification rate (r2 = 0.67). We also measured the denitrification rate in response to experimental additions of organic carbon, nitrate, and phosphorus. Experimental nitrate additions stimulated denitrification in sediments of all lakes, regardless of N deposition level. In fact, the rate of denitrification in nitrate-amended treatments was the same magnitude for lakes in both deposition areas. These findings suggest that lake sediments possess considerable capacity to remove nitrate and that this capacity has not been saturated under conditions of chronic N loading. Further, nitrous oxide was nearly 3% of the total gaseous product during denitrification in high-deposition lakes, a fraction that is comparable to polluted marine sediments. Our findings suggest that, while lakes play an important role in N removal in the landscape, they may be a source of N2O emissions, especially in areas subject to elevated N inputs.
Thermal deposition of intact tetrairon(III) single-molecule magnets in high-vacuum conditions.
Margheriti, Ludovica; Mannini, Matteo; Sorace, Lorenzo; Gorini, Lapo; Gatteschi, Dante; Caneschi, Andrea; Chiappe, Daniele; Moroni, Riccardo; de Mongeot, Francesco Buatier; Cornia, Andrea; Piras, Federica M; Magnani, Agnese; Sessoli, Roberta
2009-06-01
A tetrairon(III) single-molecule magnet is deposited using a thermal evaporation technique in high vacuum. The chemical integrity is demonstrated by time-of-flight secondary ion mass spectrometry on a film deposited on Al foil, while superconducting quantum interference device magnetometry and alternating current susceptometry of a film deposited on a kapton substrate show magnetic properties identical to the pristine powder. High-frequency electron paramagnetic resonance spectra confirm the characteristic behavior for a system with S = 5 and a large Ising-type magnetic anisotropy. All these results indicate that the molecules are not damaged during the deposition procedure keeping intact the single-molecule magnet behavior.
Energy Technology Data Exchange (ETDEWEB)
Cao Zongze; Yang Yuhua [Key Laboratory of Analytical Chemistry for Life Science of Shaanxi Province, School of Chemistry and Materials Science, Shaanxi Normal University, Xi' an, 710062 (China); Department of Chemistry and Biology, Ryerson University, 350 Victoria Street, Toronto, Ontario, M5B 2K3 (Canada); Lu, Julia, E-mail: julialu@ryerson.c [Department of Chemistry and Biology, Ryerson University, 350 Victoria Street, Toronto, Ontario, M5B 2K3 (Canada); Key Laboratory of Analytical Chemistry for Life Science of Shaanxi Province, School of Chemistry and Materials Science, Shaanxi Normal University, Xi' an, 710062 (China); Zhang Chengxiao, E-mail: cxzhang@snnu.edu.c [Key Laboratory of Analytical Chemistry for Life Science of Shaanxi Province, School of Chemistry and Materials Science, Shaanxi Normal University, Xi' an, 710062 (China)
2011-02-15
Physical characterization and chemical analysis of settled dusts collected in Xi'an from November 2007 to December 2008 show that (1) dust deposition rates ranged from 14.6 to 350.4 g m{sup -2} yr{sup -1}. The average deposition rate (76.7 g m{sup -2} yr{sup -1}) ranks the 11th out of 56 dust deposition rates observed throughout the world. The coal-burning power was the major particle source; (2) on average (except site 4), {approx}10% of the settled dusts having size <2.6, {approx}30% having size <10.5, and >70% having size <30 {mu}m; (3) the concentrations for 20 out of 27 elements analyzed were upto 18 times higher than their soil background values in China. With such high deposition rates of dusts that contain elevated levels of toxic elements, actions should be taken to reduce emission and studies are needed to assess the potential impacts of settled particles on surface ecosystem, water resource, and human health in the area. - Research highlights: High atmospheric dust deposition rate in Xi'an, Shaanxi, China. Coal-burning power plan being a major source of particulate matter in Xi'an area. High levels of toxic elements in the settled dusts. Enrichment of heavy metals (e.g., Pb, Ni, Cu) in fine particles. - Atmospheric dust deposition rate is high and the levels of toxic elements associated with the settled dusts are elevated in Xi'an, Shaanxi, China.
Laser ablation deposition measurements from silver and nickel
DEFF Research Database (Denmark)
Svendsen, Winnie Edith; Ellegaard, Ole; Schou, Jørgen
1996-01-01
The deposition rate for laser ablated metals has been studied in a standard geometry for fluences up to 20 J/cm(2). The rate for silver and nickel is a few percent of a monolayer per pulse at the laser wavelengths 532 nm and 355 nm. The rate for nickel is significantly higher than that for silver...... at 532 nm, whereas the rate for the two metals is similar at 355 nm. This behaviour disagrees with calculations based on the thermal properties at low intensities as well as predictions based on formation of an absorbing plasma at high intensities. The deposition rate falls strongly with increasing...
Energy Technology Data Exchange (ETDEWEB)
Luo, Xian, E-mail: luo_shenfan@hotmail.com; Wu, Shuai; Yang, Yan-qing; Jin, Na; Liu, Shuai; Huang, Bin
2016-12-01
The deposition characteristics of titanium coating on SiC fiber using TiCl{sub 4}-H{sub 2}-Ar gas mixture in a cold-wall chemical vapor deposition were studied by the combination of thermodynamic analysis and experimental studies. The thermodynamic analysis of the reactions in the TiCl{sub 4}-H{sub 2}-Ar system indicates that TiCl{sub 4} transforms to titanium as the following paths: TiCl{sub 4} → TiCl{sub 3} → Ti, or TiCl{sub 4} → TiCl{sub 3} → TiCl{sub 2} → Ti. The experimental results show that typical deposited coating contains two distinct layers: a TiC reaction layer close to SiC fiber and titanium coating which has an atomic percentage of titanium more than 70% and that of carbon lower than 30%. The results illustrate that a carbon diffusion barrier coating needs to be deposited if pure titanium is to be prepared. The deposition rate increases with the increase of temperature, but higher temperature has a negative effect on the surface uniformity of titanium coating. In addition, appropriate argon gas flow rate has a positive effect on smoothing the surface morphology of the coating. - Highlights: • Both thermodynamic analysis and experimental studies were adopted in this work. • The transformation paths of TiCl{sub 4} to Ti is: TiCl{sub 4} → TiCl{sub 3} → Ti, or TiCl{sub 4} → TiCl{sub 3} → TiCl{sub 2} → Ti. • Typical deposited Ti coating on SiC fiber contained two distinct layers. • Deposition temperature is important on deposition rate and morphologies. • Appropriate argon gas flow rate has a positive effect on smoothing of the coating.
Energy Technology Data Exchange (ETDEWEB)
Ghaderi, Mohammad Reza; Eslampanah, Amirhossein; Ghaderi, Kianoosh [Islamic Azad University, Sanandaj (Iran, Islamic Republic of); Aghakhani, Masood [Razi University, Kermanshah (Iran, Islamic Republic of)
2015-01-15
We used a novel optimization algorithm based on the imperialist competitive algorithm (ICA) to optimize the deposition rate in the submerged arc welding (SAW) process. This algorithm offers some advantages such as simplicity, accuracy and time saving. Experiments were conducted based on a five factor, five level rotatable central composite design (RCCD) to collect welding data for deposition rate as a function of welding current, arc voltage, contact tip to plate distance, welding speed and thickness of TiO{sub 2} nanoparticles coated on the plates of mild steel. Furthermore, regression equation for deposition rate was obtained using least squares method. The regression equation as the cost function was optimized using ICA. Ultimately, the levels of input variables to achieve maximum deposition rate were obtained using ICA. Computational results indicate that the proposed algorithm is quite effective and powerful in optimizing the cost function.
Preparation of high T/sup c/ Nb3Ge superconductors by chemical vapor deposition
International Nuclear Information System (INIS)
Newkirk, L.R.; Valencia, F.A.; Wallace, T.C.
1975-01-01
Bulk layers of Nb 3 Ge were deposited on copper substrates at 900 0 C by the hydrogen reduction of the chlorides of niobium and germanium with resistive T/sub c/'s as high as 22.5 0 K and current densities up to 1.8 x 10 6 amp cm -2 at 13.8 0 K. A detailed description of the coating process as well as empirical correlations between deposition parameters and T/sub c/ is given. Quantitative chlorination of Nb was found to be possible at T approximately equal to 250 0 C and for T greater than 900 0 C extending the range of delivery rates below those obtainable by powder feeding of NbCl 5 . Coatings in the range of 10 to 60 μm thick have been produced with a typical deposition efficiency of 50 to 65 percent for mass flow rates of the order of 1 g of salt per minute. The superconducting transition temperature has been correlated with a parameter of the form mole ratio x dilution x Reynolds number 0.22, where mole ratio is defined by moles Nb:moles (Ge + O) in the gas stream, and dilution by moles gas:moles salt. In addition, the relationship between mole ratio and dilution which determines the phase produced (Nb 3 Ge or Nb 5 Ge 3 ) is defined over the region of major interest. Lattice spacings are presented over a range of T/sub c/'s, and microstructure and substrate adherence are discussed. (U.S.)
Corrosion properties of plasma deposited high-alloy steel
Czech Academy of Sciences Publication Activity Database
Voleník, Karel; Pražák, M.; Kalabisová, E.; Kreislová, K.; Neufuss, Karel
2002-01-01
Roč. 47, - (2002), s. 243-254 ISSN 0001-7043 R&D Projects: GA ČR GA106/99/0298 Institutional research plan: CEZ:AV0Z2043910 Keywords : plasma deposits, high-alloy steel, polarization curves, corrosion test Subject RIV: BL - Plasma and Gas Discharge Physics
Torgovkin, A.; Chaudhuri, S.; Ruhtinas, A.; Lahtinen, M.; Sajavaara, T.; Maasilta, I. J.
2018-05-01
Superconducting titanium nitride (TiN) thin films were deposited on magnesium oxide, sapphire and silicon nitride substrates at 700 °C, using a pulsed laser deposition (PLD) technique, where infrared (1064 nm) pulses from a solid-state laser were used for the ablation from a titanium target in a nitrogen atmosphere. Structural studies performed with x-ray diffraction showed the best epitaxial crystallinity for films deposited on MgO. In the best films, superconducting transition temperatures, T C, as high as 4.8 K were observed, higher than in most previous superconducting TiN thin films deposited with reactive sputtering. A room temperature resistivity down to ∼17 μΩ cm and residual resistivity ratio up to 3 were observed in the best films, approaching reported single crystal film values, demonstrating that PLD is a good alternative to reactive sputtering for superconducting TiN film deposition. For less than ideal samples, the suppression of the film properties were correlated mostly with the unintended incorporation of oxygen (5–10 at%) in the film, and for high oxygen content films, vacuum annealing was also shown to increase the T C. On the other hand, superconducting properties were surprisingly insensitive to the nitrogen content, with high quality films achieved even in the highly nitrogen rich, Ti:N = 40/60 limit. Measures to limit oxygen exposure during deposition must be taken to guarantee the best superconducting film properties, a fact that needs to be taken into account with other deposition methods, as well.
High resolution luminescence chronology for Xiashu Loess deposits of Southeastern China
Yi, Shuangwen; Li, Xusheng; Han, Zhiyong; Lu, Huayu; Liu, Jinfeng; Wu, Jiang
2018-04-01
Loess deposits in Xiashu are representative of such deposits in Southeastern China that are mainly distributed in the middle and lower reaches of the Yangtze River valley. These loess-paleosol sequences provide a key archive of past climate change in humid, subtropical regions. However, the ages of the sequences are not well constrained. In this study, the standard quartz single-aliquot regenerative (SAR) dose optically stimulated luminescence (OSL) and K-feldspar post-infrared infrared stimulated luminescence (post-IR IRSL; pIRIR290) methods are used to date two loess sequences in Nanjing region. Our results show that quartz SAR OSL and K-feldspar pIRIR290 ages are more or less indistinguishable from one another up to ∼50 ka. Beyond this age, the K-feldspar pIRIR ages increased systematically with deposition depth, agreeing well with the expected ages as far as ∼200 ka. On the basis of a fully independently-dated timescale, we are therefore able to propose, for the first time, a new age model for the Xiashu Loess deposits accumulated since the penultimate interglacial period. Using our newly obtained luminescence dating ages, we observe a marked difference between the loess accumulation rates in the two sequences, potentially forced by regional depositional processes and loess preservation.
Innovative High-Performance Deposition Technology for Low-Cost Manufacturing of OLED Lighting
Energy Technology Data Exchange (ETDEWEB)
Scott, David; Hamer, John
2017-06-30
In this project, OLEDWorks developed and demonstrated the innovative high-performance deposition technology required to deliver dramatic reductions in the cost of manufacturing OLED lighting in production equipment. The current high manufacturing cost of OLED lighting is the most urgent barrier to its market acceptance. The new deposition technology delivers solutions to the two largest parts of the manufacturing cost problem – the expense per area of good product for organic materials and for the capital cost and depreciation of the equipment. Organic materials cost is the largest expense item in the bill of materials and is predicted to remain so through 2020. The high-performance deposition technology developed in this project, also known as the next generation source (NGS), increases material usage efficiency from 25% found in current Gen2 deposition technology to 60%. This improvement alone results in a reduction of approximately $25/m2 of good product in organic materials costs, independent of production volumes. Additionally, this innovative deposition technology reduces the total depreciation cost from the estimated value of approximately $780/m2 of good product for state-of-the-art G2 lines (at capacity, 5-year straight line depreciation) to $170/m2 of good product from the OLEDWorks production line.
Directory of Open Access Journals (Sweden)
B. Khorrami Mokhori
2017-02-01
Full Text Available In this research titanium nitride (TiN films were prepared by plasma assisted chemical vapor deposition using TiCl4, H2, N2 and Ar on the AISI H13 tool steel. Coatings were deposited during different substrate temperatures (460°C, 480 ° C and 510 °C. Wear tests were performed in order to study the acting wear mechanisms in the high(400 °C and low (25 °C temperatures by ball on disc method. Coating structure and chemical composition were characterized using scanning electron microscopy, microhardness and X-ray diffraction. Wear test result was described in ambient temprature according to wear rate. It was evidenced that the TiN coating deposited at 460 °C has the least weight loss with the highest hardness value. The best wear resistance was related to the coating with the highest hardness (1800 Vickers. Wear mechanisms were observed to change by changing wear temperatures. The result of wear track indicated that low-temprature wear has surface fatigue but high-temperature wear showed adhesive mechanism.
Energy Technology Data Exchange (ETDEWEB)
Omar, W. [Department of Natural Resources and Chemical Engineering, Tafila Technical University, Tafila (Jordan); Ulrich, J. [FB Ingenieurwissenschaften, Institut fuer Verfahrenstechnik/TVT, Martin-Luther-Universitaet Halle-Wittenberg, Halle (Germany)
2006-08-15
The scaling problem in Multi Effect Distillation (MED) evaporators is investigated by the experimental measurement of the deposition rate under different operating conditions. The measurements are conducted in a batch vessel containing artificial seawater, which is allowed to contact the outer surface of a hot pipe under controlled temperature, salinity and pH. The rate of mass deposition is higher at elevated temperature. The salinity of the seawater also influences the scaling process - an increase in salinity from 47-59 g/L leads to an increase of 75.6 % in the deposition rate. Decreasing the pH value of seawater to 2.01 results in a complete inhibition of scaling, whereas the severity of the scaling increases in neutral and basic mediums. Polyacrylic acid is tested as an antifoulant and it was found that its presence in seawater reduces the scaling process. The nature of the heat transfer surface material also plays an important role in the scaling process. It is found experimentally that the rate of scaling is higher in the case of a Cu-Ni alloy as the surface material of the tube rather than stainless steel. (Abstract Copyright [2006], Wiley Periodicals, Inc.)
Liu, Fei; Lin, Guo-he
2018-03-01
High organic soft soil, which is distributed at Ji Lin province in China, has been studied by a lot of scholars. In the paper, structural characteristics with different deposition ages have been researched by experimental tests. Firstly, the characteristics of deposition age, degree of decompositon, high-pressure consolidation and microstructure have been measured by a series of tests. Secondly, structural strengths which were deposited in different ages, have been carried out to test the significant differences of stress-strain relations between remoulded and undisturbed high organic soft soil samples. Results showed that high organic soft soil which is deposited at different ages will influence its structural characteristics.
Enhanced nitrogen deposition over China
Energy Technology Data Exchange (ETDEWEB)
Liu, Xuejun; Zhang, Ying; Han, Wenxuan; Tang, Aohan; Shen, Jianlin; Cui, Zhenling; Christie, Peter; Zhang, Fusuo [College of Resources and Environmental Sciences, China Agricultural University, Beijing 100193 (China); Vitousek, Peter [Department of Biology, Stanford University, Stanford, California 94305 (United States); Erisman, Jan Willem [VU University Amsterdam, 1081 HV Amsterdam (Netherlands); Goulding, Keith [The Sustainable Soils and Grassland Systems Department, Rothamsted Research, Harpenden AL5 2JQ (United Kingdom); Fangmeier, Andreas [Institute of Landscape and Plant Ecology, University of Hohenheim, 70593 Stuttgart (Germany)
2013-02-28
China is experiencing intense air pollution caused in large part by anthropogenic emissions of reactive nitrogen. These emissions result in the deposition of atmospheric nitrogen (N) in terrestrial and aquatic ecosystems, with implications for human and ecosystem health, greenhouse gas balances and biological diversity. However, information on the magnitude and environmental impact of N deposition in China is limited. Here we use nationwide data sets on bulk N deposition, plant foliar N and crop N uptake (from long-term unfertilized soils) to evaluate N deposition dynamics and their effect on ecosystems across China between 1980 and 2010. We find that the average annual bulk deposition of N increased by approximately 8 kilograms of nitrogen per hectare (P < 0.001) between the 1980s (13.2 kilograms of nitrogen per hectare) and the 2000s (21.1 kilograms of nitrogen per hectare). Nitrogen deposition rates in the industrialized and agriculturally intensified regions of China are as high as the peak levels of deposition in northwestern Europe in the 1980s, before the introduction of mitigation measures. Nitrogen from ammonium (NH4+) is the dominant form of N in bulk deposition, but the rate of increase is largest for deposition of N from nitrate (NO3-), in agreement with decreased ratios of NH3 to NOx emissions since 1980. We also find that the impact of N deposition on Chinese ecosystems includes significantly increased plant foliar N concentrations in natural and semi-natural (that is, non-agricultural) ecosystems and increased crop N uptake from long-term-unfertilized croplands. China and other economies are facing a continuing challenge to reduce emissions of reactive nitrogen, N deposition and their negative effects on human health and the environment.
Room-temperature plasma-enhanced chemical vapor deposition of SiOCH films using tetraethoxysilane
International Nuclear Information System (INIS)
Yamaoka, K.; Yoshizako, Y.; Kato, H.; Tsukiyama, D.; Terai, Y.; Fujiwara, Y.
2006-01-01
Carbon-doped silicon oxide (SiOCH) thin films were deposited by room-temperature plasma-enhanced chemical vapor deposition (PECVD) using tetraethoxysilane (TEOS). The deposition rate and composition of the films strongly depended on radio frequency (RF) power. The films deposited at low RF power contained more CH n groups. The SiOCH films showed high etch rate and low refractive index in proportion to the carbon composition. The deposition with low plasma density and low substrate temperature is effective for SiOCH growth by PECVD using TEOS
Pulsed laser deposition of SrRuO3 thin-films: The role of the pulse repetition rate
Directory of Open Access Journals (Sweden)
H. Schraknepper
2016-12-01
Full Text Available SrRuO3 thin-films were deposited with different pulse repetition rates, fdep, epitaxially on vicinal SrTiO3 substrates by means of pulsed laser deposition. The measurement of several physical properties (e.g., composition by means of X-ray photoelectron spectroscopy, the out-of-plane lattice parameter, the electric conductivity, and the Curie temperature consistently reveals that an increase in laser repetition rate results in an increase in ruthenium deficiency in the films. By the same token, it is shown that when using low repetition rates, approaching a nearly stoichiometric cation ratio in SrRuO3 becomes feasible. Based on these results, we propose a mechanism to explain the widely observed Ru deficiency of SrRuO3 thin-films. Our findings demand these theoretical considerations to be based on kinetic rather than widely employed thermodynamic arguments.
International Nuclear Information System (INIS)
Teren, Andrew R.; Thomas, Reji; He, Jiaqing; Ehrhart, Peter
2005-01-01
Hafnium oxide films were deposited on Si(100) substrates using pulsed metal-organic chemical vapor deposition (CVD) and evaluated for high-K dielectric applications. Three types of precursors were tested: two oxygenated ones, Hf butoxide-dmae and Hf butoxide-mmp, and an oxygen-free one, Hf diethyl-amide. Depositions were carried out in the temperature range of 350-650 deg. C, yielding different microstructures ranging from amorphous to crystalline, monoclinic, films. The films were compared on the basis of growth rate, phase development, density, interface characteristics, and electrical properties. Some specific features of the pulsed injection technique are considered. For low deposition temperatures the growth rate for the amide precursor was significantly higher than for the mixed butoxide precursors. A thickness-dependent amorphous to crystalline phase transition temperature was found for all precursors. There is an increase of the film density along with the deposition temperature from values as low as 5 g/cm 3 at 350 deg. C to values close to the bulk value of 9.7 g/cm 3 at 550 deg. C. Crystallization is observed in the same temperature range for films of typically 10-20 nm thickness. However, annealing studies show that this density increase is not simply related to the crystallization of the films. Similar electrical properties could be observed for all precursors and the dielectric constant of the films reaches values similar to the best values reported for bulk crystalline HfO 2
Deposition of amino-rich thin films by RF magnetron sputtering of nylon
Energy Technology Data Exchange (ETDEWEB)
Kylian, O; Hanus, J; Choukourov, A; Kousal, J; SlavInska, D; Biederman, H, E-mail: ondrej.kylian@gmail.co [Charles University, Faculty of Mathematics and Physics, V Holesovickach 2, Prague 8, 180 00 (Czech Republic)
2009-07-21
RF magnetron sputtering of a nylon target in different gas mixtures was studied in order to evaluate the capability of this process to deposit amino-rich coatings needed in a wide range of biomedical applications. It has been demonstrated that both the deposition rate of the coatings and the surface density of primary amino groups are strongly linked with working gas mixture composition. From this point of view, a sufficiently high deposition rate as well as the highest amine efficiency reaching a NH{sub 2}/C value of 18% was observed in the N{sub 2}/H{sub 2} discharge, which leads to the surface exhibiting a high rate of protein adsorption. (fast track communication)
Atomic layer deposition of GaN at low temperatures
Energy Technology Data Exchange (ETDEWEB)
Ozgit, Cagla; Donmez, Inci; Alevli, Mustafa; Biyikli, Necmi [UNAM - Institute of Materials Science and Nanotechnology, Bilkent University, 06800 Ankara (Turkey)
2012-01-15
The authors report on the self-limiting growth of GaN thin films at low temperatures. Films were deposited on Si substrates by plasma-enhanced atomic layer deposition using trimethylgallium (TMG) and ammonia (NH{sub 3}) as the group-III and -V precursors, respectively. GaN deposition rate saturated at 185 deg. C for NH{sub 3} doses starting from 90 s. Atomic layer deposition temperature window was observed from 185 to {approx}385 deg. C. Deposition rate, which is constant at {approx}0.51 A/cycle within the temperature range of 250 - 350 deg. C, increased slightly as the temperature decreased to 185 deg. C. In the bulk film, concentrations of Ga, N, and O were constant at {approx}36.6, {approx}43.9, and {approx}19.5 at. %, respectively. C was detected only at the surface and no C impurities were found in the bulk film. High oxygen concentration in films was attributed to the oxygen impurities present in group-V precursor. High-resolution transmission electron microscopy studies revealed a microstructure consisting of small crystallites dispersed in an amorphous matrix.
Mast, M. Alisa; Turk, John T.; Clow, David W.; Campbell, Donald D.
2011-01-01
Trends in precipitation chemistry and hydrologic and climatic data were examined as drivers of long-term changes in the chemical composition of high-elevation lakes in three wilderness areas in Colorado during 1985-2008. Sulfate concentrations in precipitation decreased at a rate of -0.15 to -0.55 μeq/l/year at 10 high-elevation National Atmospheric Deposition Program stations in the state during 1987-2008 reflecting regional reductions in SO2 emissions. In lakes where sulfate is primarily derived from atmospheric inputs, sulfate concentrations also decreased although the rates generally were less, ranging from -0.12 to -0.27 μeq/l/year. The similarity in timing and sulfur isotopic data support the hypothesis that decreases in atmospheric deposition are driving the response of high-elevation lakes in some areas of the state. By contrast, in lakes where sulfate is derived primarily from watershed weathering sources, sulfate concentrations showed sharp increases during 1985-2008. Analysis of long-term climate records indicates that annual air temperatures have increased between 0.45 and 0.93°C per decade throughout most mountainous areas of Colorado, suggesting climate as a factor. Isotopic data reveal that sulfate in these lakes is largely derived from pyrite, which may indicate climate warming is preferentially affecting the rate of pyrite weathering.
Ultrashort pulse laser deposition of thin films
Perry, Michael D.; Banks, Paul S.; Stuart, Brent C.
2002-01-01
Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.
Effect of PbI{sub 2} deposition rate on two-step PVD/CVD all-vacuum prepared perovskite
Energy Technology Data Exchange (ETDEWEB)
Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos, E-mail: fostiropoulos@helmholtz-berlin.de
2016-12-15
In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI{sub 2} and chemical vapour deposition (CVD) of CH{sub 3}NH{sub 3}I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI{sub 2} film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH{sub 3}NH{sub 3}I is fostered for PbI{sub 2} films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI{sub 2} on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH{sub 3}NCH{sub 3} molecules been fostered by increasing the PVD rate of PbI{sub 2} and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI{sub 2} (001) crystallite planes. • CH{sub 3}NH{sub 3}I intercalation process fostered by increased PbI{sub 2} PVD rate. • Stoichiometric CH{sub 3}NH{sub 3}PbI{sub 3} suitable as absorber in photovoltaic applications • Reduced PbI{sub 2} residue at the bottom of CH{sub 3}NH{sub 3}PbI{sub 3} improves device performance.
2013-10-28
... Account. These funds are held ``in trust'' for the obligor and currently earn simple interest at the rate..., the Government has paid simple interest at the rate of 3 percent per year on cash deposited by bond... #0;notices is to give interested persons an opportunity to participate in #0;the rule making prior to...
DEFF Research Database (Denmark)
Koivisto, Antti J.; Jensen, Alexander C. Ø.; Kling, Kirsten I.
2017-01-01
Here, we studied the particle release rate during Electrostatic spray deposition of anatase-(TiO2)-based photoactive coating onto tiles and wallpaper using a commercially available electrostatic spray device. Spraying was performed in a 20.3m3 test chamber while measuring concentrations of 5.6nm ...
Energy Technology Data Exchange (ETDEWEB)
Ben Amor, Sana; Dimassi, Wissem; Ali Tebai, Mohamed; Ezzaouia, Hatem [Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif (Tunisia)
2012-10-15
Hydrogenated amorphous silicon (a-Si:H) thin films were deposited from pure silane (SiH{sub 4}) and hydrogen (H{sub 2}) gas mixture by plasma enhanced chemical vapor deposition (PECVD) method at low temperature (400 C) using high rf power (60 W). The structural and optical properties of these films are systematically investigated as a function of the flow rate of hydrogen (F{sub H2}).The surface morphology is analyzed by atomic force microscopy (AFM). The characterization of these films with low angle X-ray diffraction revealed that the crystallite size in the films tends to decrease with increase in (F{sub H2}). The Fourier transform infrared (FTIR) spectroscopic analysis showed that at low values of (F{sub H2}),the hydrogen bonding in Si:H films shifts from di-hydrogen (Si-H{sub 2}) and (Si-H{sub 2})n complexes to the mono-hydrogen (Si-H) bonding configuration. Finally, for these optimized conditions, the deposition rate decreases with increasing (F{sub H2}). (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
Nanostructured high valence silver oxide produced by pulsed laser deposition
International Nuclear Information System (INIS)
Dellasega, D.; Facibeni, A.; Di Fonzo, F.; Russo, V.; Conti, C.; Ducati, C.; Casari, C.S.; Li Bassi, A.; Bottani, C.E.
2009-01-01
Among silver oxides, Ag 4 O 4 , i.e. high valence Ag(I)Ag(III) oxide, is interesting for applications in high energy batteries and for the development of antimicrobial coatings. We here show that ns UV pulsed laser deposition (PLD) in an oxygen containing atmosphere allows the synthesis of pure Ag 4 O 4 nanocrystalline thin films, permitting at the same time to control the morphology of the material at the sub-micrometer scale. Ag 4 O 4 films with a crystalline domain size of the order of tens of nm can be deposited provided the deposition pressure is above a threshold (roughly 4 Pa pure O 2 or 20 Pa synthetic air). The formation of this particular high valence silver oxide is explained in terms of the reactions occurring during the expansion of the ablated species in the reactive atmosphere. In particular, expansion of the PLD plasma plume is accompanied by formation of low stability Ag-O dimers and atomic oxygen, providing reactive species at the substrate where the film grows. Evidence of reactive collisions in the expanding ablation plume is obtained by analysis of the plume visible shape in inert and reactive atmospheres. In addition, we show how the dimensionless deposition parameter L, relating the target-to-substrate distance to the ablation plume maximum expansion length, can be used to classify different growth regimes. It is thus possible to vary the stoichiometry and the morphology of the films, from compact and columnar to foam-like, by controlling both the gas pressure and the target-to-substrate distance
Silk, Wendy Kuhn; Hsiao, Theodore C.; Diedenhofen, Ulrike; Matson, Christina
1986-01-01
Densities of osmoticum and potassium were measured as a function of distance from the tip of the primary root of Zea mays L. (cv WF9 × mo17). Millimeter segments were excised and analyzed for osmotic potential by a miniaturized freezing point depression technique, and for potassium by flame spectrophotometry. Local deposition rates were estimated from the continuity equation with values for density and growth velocity. Osmotic potential was uniform, −0.73 ± 0.05 megapascals, throughout the growth zone of well-watered roots. Osmoticum deposition rate was 260 μosmoles per gram fresh weight per hour. Potassium density fell from 117 micromoles per gram in the first mm region to 48 micromoles per gram at the base of the growth zone. Potassium deposition rates had a maximum of 29 micromoles per gram per hour at 3.5 millimeters from the tip and were positive (i.e. potassium was being added to the tissue) until 8 millimeters from the tip. The results are discussed in terms of ion relations of the growing zone and growth physics. PMID:16665121
Park, Jun Seok; Park, Joo Hyun; Lee, Min-Gyu; Sung, Ji Hyun; Cha, Kyoung Je; Kim, Da Hye
2016-05-01
Among the many additive manufacturing technologies, the directed energy deposition (DED) process has attracted significant attention because of the application of metal products. Metal deposited by the DED process has different properties than wrought metal because of the rapid solidification rate, the high thermal gradient between the deposited metal and substrate, etc. Additionally, many operating parameters, such as laser power, beam diameter, traverse speed, and powder mass flow rate, must be considered since the characteristics of the deposited metal are affected by the operating parameters. In the present study, the effect of energy input on the characteristics of H13 and D2 steels deposited by a direct metal tooling process based on the DED process was investigated. In particular, we report that the hardness of the deposited H13 and D2 steels decreased with increasing energy input, which we discuss by considering microstructural observations and thermodynamics.
International Nuclear Information System (INIS)
Stinton, D.P.; Lackey, W.J.
1977-10-01
Silicon carbide coatings on HTGR microsphere fuel act as the barrier to contain metallic fission products. Silicon carbide coatings were applied by the decomposition of CH 3 SiCl 3 in a 13-cm-diam (5-in.) fluidized-bed coating furnace. The effects of temperature, CH 3 SiCl 3 supply rate and the H 2 :CH 3 SiCl 3 ratio on coating properties were studied. Deposition temperature was found to control coating density, whole particle crushing strength, coating efficiency, and microstructure. Coating density and microstructure were also partially determined by the H 2 :CH 3 SiCl 3 ratio. From this work, it appears that the rate at which high quality SiC can be deposited can be increased from 0.2 to 0.5 μm/min
Energy Technology Data Exchange (ETDEWEB)
Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))
1990-01-01
The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.
Energy Technology Data Exchange (ETDEWEB)
Peng, Shou [State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan 430000 (China); State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for Glass Industry, Bengbu 233000 (China); Yang, Yong, E-mail: 88087113@163.com [State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for Glass Industry, Bengbu 233000 (China); Li, Gang; Jiang, Jiwen; Jin, Kewu; Yao, TingTing; Zhang, Kuanxiang [State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for Glass Industry, Bengbu 233000 (China); Cao, Xin [State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for Glass Industry, Bengbu 233000 (China); School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116000 (China); Wang, Yun; Xu, Genbao [State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for Glass Industry, Bengbu 233000 (China)
2016-09-05
N doped TiO{sub 2} films were deposited on glass substrates at room temperature using DC coupled RF magnetron sputtering with a TiO{sub 2} ceramic target. The influences of N{sub 2} flow rate on the deposition rate, crystal structure, chemical composition and band gap of the deposited films were investigated by Optical profiler, X-ray diffraction, X-ray photoelectron spectroscope and ultraviolet-visible spectrophotometer. The film growth rate gradually decreased with increasing N{sub 2} flow rate. As N{sub 2} flow rate increased, the crystallization of the films deteriorated, and the films tended to form amorphous structure. XPS analysis revealed that N dopant atoms were added at the substitutional sites into TiO{sub 2} lattice structure. FE-SEM results showed that the grain size of the film decreased and the crystallinity degraded as N{sub 2} flow rate increases. In addition, N doping caused an obvious red shift in the optical absorption edge. - Highlights: • N doped TiO{sub 2} films were deposited by DC coupled RF magnetron reactive sputtering. • As N{sub 2} flow rate increases, the crystallization of the deposited films degrades. • The higher N{sub 2} flow rate is beneficial to form more substituted N in the film. • N doping causes an obvious red shift in the absorption wavelength.
Waldrop, M.; Zak, D.; Sinsabaugh, R.
2002-12-01
Atmospheric nitrogen (N) deposition may alter soil biological activity in northern hardwood forests by repressing phenol oxidase enzyme activity and altering microbial community composition, thereby slowing decomposition and increasing the export of phenolic compounds. We tested this hypothesis by adding 13C-labelled cellobiose, vanillin, and catechol to control and N fertilized soils (30 and 80 kg ha-1) collected from three forests; two dominated by Acer Saccharum and one dominated by Quercus Alba and Quercus Velutina. While N deposition increased total microbial respiration, it decreased soil oxidative enzyme activities, resulting in slower degradation rates of all compounds, and larger DOC pools. This effect was larger in the oak forest, where fungi dominate C-cycling processes. DNA and 13C-phospolipid analyses showed that N addition altered the fungal community and reduced the activity of fungal and bacterial populations in soil, potentially explaining reduced soil enzyme activities and incomplete decomposition.
Deposition of thin films and surface modification by pulsed high energy density plasma
International Nuclear Information System (INIS)
Yan Pengxun; Yang Size
2002-01-01
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition. The authors present detailed theoretical and experimental studies of the production mechanism and physical properties of the pulsed plasma. The basic physics of the pulsed plasma-material interaction has been investigated. Diagnostic measurements show that the pulsed plasma has a high electron temperature of 10-100 eV, density of 10 14 -10 16 cm -3 , translation velocity of ∼10 -7 cm/s and power density of ∼10 4 W/cm 2 . Its use in material surface treatment combines the effects of laser surface treatment, electron beam treatment, shock wave bombardment, ion implantation, sputtering deposition and chemical vapor deposition. The metastable phase and other kinds of compounds can be produced on low temperature substrates. For thin film deposition, a high deposition ratio and strong film to substrate adhesion can be achieved. The thin film deposition and material surface modification by the pulsed plasma and related physical mechanism have been investigated. Thin film c-BN, Ti(CN), TiN, DLC and AlN materials have been produced successfully on various substrates at room temperature. A wide interface layer exists between film and substrate, resulting in strong adhesion. Metal surface properties can be improved greatly by using this kind of treatment
High powered pulsed plasma enhanced deposition of thin film semiconductor and optical materials
International Nuclear Information System (INIS)
Llewellyn, I.P.; Sheach, K.J.A.; Heinecke, R.A.
1993-01-01
A glow discharge deposition technique is described which allows the deposition of a large range of high quality materials without the requirement for substrate heating. The method is differentiated from conventional plasma deposition techniques in that a much higher degree of dissociation is achieved in the gases prior to deposition, such that thermally activated surface reactions are no longer required in order to produce a dense film. The necessary discharge intensity (>300Wcm -3 ) is achieved using a high power radio frequency generator which is pulsed at a low duty cycle (1%) to keep the average energy of the discharge low (100W), in order to avoid the discharge heating the substrate. In addition, by varying the gas composition between discharge pulses, layered structures of materials can be produced, with a disordered interface about 8 A thick. Various uses of the technique in semiconductor and optical filter production are described, and the properties of films deposited using these technique are presented. (orig.)
Sugiyanto; Zukhronah, Etik; Nur Aini, Anis
2017-12-01
Several times Indonesia has experienced to face a financial crisis, but the crisis occurred in 1997 had a tremendous impact on the economy and national stability. The impact of the crisis fall the exchange rate of rupiah against the dollar so it is needed the financial crisis detection system. Some data of bank deposits, real exchange rate and terms of trade indicators are used in this paper. Data taken from January 1990 until December 2016 are used to form the models with three state. Combination of volatility and Markov switching models are used to model the data. The result suggests that the appropriate model for bank deposit and terms of trade is SWARCH (3,1), and for real exchange rates is SWARCH (3,2).
Sputter deposition of BSCCO films from a hollow cathode
International Nuclear Information System (INIS)
Lanagan, M.T.; Kampwirth, R.T.; Doyle, K.; Kowalski, S.; Miller, D.; Gray, K.E.
1991-01-01
High-T c superconducting thin films were deposited onto MgO single crystal substrates from a hollow cathode onto ceramic targets with the nominal composition of Bi 2 Sr 2 CaCu 2 O x . Films similar in composition to those used for the targets were deposited on MgO substrates by rf sputtering. The effects of sputtering time, rf power, and post-annealing on film microstructure and properties were studied in detail. Substrate temperature was found to have a significant influence on the film characteristics. Initial results show that deposition rates from a hollow cathode are an order of magnitude higher than those of a planar magnetron source at equivalent power levels. Large deposition rates allow for the coating of long lengths of wire
Physical Vapor Deposition of Thin Films
Mahan, John E.
2000-01-01
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
Directory of Open Access Journals (Sweden)
Cory JD Matthews
2014-11-01
Full Text Available Isotopic time series from sequentially sampled growth layer groups (GLGs in marine mammal teeth can be combined to build chronologies allowing assessment of isotopic variation in marine ecosystems. Synchronous recording of baseline isotopic variation across dentinal GLGs of species with temporal and spatial overlap in foraging offers a unique opportunity for validation of marine mammal age estimation procedures through calibration of GLG deposition rates in one species against another whose GLG deposition has been independently determined. In this study, we compare trends in stable carbon isotope ratios (d13C across dentinal GLGs of three eastern Canadian Arctic (ECA beluga (Delphinapterus leucas populations through the 1960s-2000s with a d13C time series measured across dentinal GLGs of ECA/Northwest Atlantic killer whales (Orcinus orca from 1944-1999. We use confirmed annual GLG deposition in killer whales as a means to assess beluga GLG deposition, and show linear d13C declines across chronologies of both species were statistically indistinguishable when based on annual GLG deposition in beluga whales, but differed when based on biannual deposition. We suggest d13C declines reflect the oceanic 13C Suess effect, and provide additional support for annual GLG deposition in beluga whales by comparing rates of d13C declines across beluga GLGs with published annual d13C declines attributed to the oceanic 13C Suess effect in the North Atlantic.
Evaluating Ammonia Deposition Rates for Deciduous Forest using Measurements and Modelling
DEFF Research Database (Denmark)
Hansen, Kristina; Geels, Camilla; Hertel, Ole
). However, there are relatively few datasets of atmospheric NH3 fluxes available for forests which can contribute verifying model results. The atmospheric dry deposition of NH3 for the beech (Fagus sylvatica) forest, Lille Bøgeskov, in Sorø, Denmark, is investigated using the high resolution...... these impacts, quantifying the magnitude of the NH3 flux in the biosphere atmosphere system is essential. Model simulations using the Danish Ammonia Modelling System (DAMOS) have recently indicated that particular forest ecosystems are exposed to critical load exceedances of N (Geels et al., not yet submitted......-agricultural areas (Skjøth et al. 2011, ACPD). New atmospheric NH3 flux measurements for Lille Bøgeskov have been conducted throughout 2011 and these data are presented and discussed in relation to the 2010 data of atmospheric NH3. Future studies aim to improve the description of dry deposition of NH3 for vegetative...
International Nuclear Information System (INIS)
Ren Zhaoxing; Sheng Yanya; Shi Yicai; Wen Haihu; Cao Xiaowen
1991-06-01
The evaporating deposition of Ti film and Cu film by using microwave electron cyclotron resonance (ECR) technique was investigated. It deposition rate was about 50 nm/min and the temperature of the substrate was 50∼150 deg C. The thin amorphous films with strong adherent force were obtained. The sputtering deposition with ECR plasma was studied by employing higher plasma density and ionicity and negative substrate potential to make YBaCuO superconducting film. Its film was compact and amorphous with a thickness of 1.0 μm and the deposition rate was about 10 nm/min. The results show that this technique can initiate a high density and high ionicity plasma at lower gas pressure (10 -2 ∼10 -3 Pa). This plasma is the most suitable plasma source in thin film deposition process and surface treatment technique
Ash deposition and high temperature corrosion at combustion of aggressive fuels
Energy Technology Data Exchange (ETDEWEB)
Hede Larsen, O [I/S Fynsvaerket, Faelleskemikerne, Odense (Denmark); Henriksen, N [Elsamprojekt A/S, Faelleskemikerne, Fredericia (Denmark)
1996-12-01
In order to reduce CO{sub 2} emission, ELSAM is investigating the possibilities of using biomass - mainly straw - for combustion in high efficiency power plants. As straw has very high contents of chlorine and potassium, a fuel with high corrosion and ash deposition propensities has been introduced. ELSAM has investigated 3 ultra supercritical boiler concepts for combustion of straw alone or together with coal: (1) PF boilers with a relatively low share of straw, (2) CFB boilers with low to high share of straw and (3) vibrating grate boilers with 100% straw. These investigations has mainly been full-scale tests with straw fed into existing boilers. Corrosion tests have been performed in these boilers using temperature regulated probes and in-plant test tubes in existing superheaters. The corrosion has been determined by detailed measurements of wall thickness reduction and light optical microscopic measurements of the material degradation due to high temperature corrosion. Corrosion mechanisms have been evaluated using SEM/EDX together with thermodynamical considerations based on measurements of the chemical environment in the flue gas. Ash deposition is problematic in CFB boilers and in straw fired boilers, especially in years with high potassium and chlorine content of the straw. This ash deposition also is related to condensation of KCl and can probably only be handled by improved cleaning devices. (EG)
Energy Technology Data Exchange (ETDEWEB)
Lindberg, S.E.; Harriss, R.C.; Turner, R.R.; Shriner, D.S.; Huff, D.D.
1979-06-01
The critical links between anthropogenic emissions to the atmosphere and their effects on ecosystems are the mechanisms and rates of atmospheric deposition. The atmospheric input of several trace elements and sulfate to a deciduous forest canopy is quantified and the major mechanisms of deposition are determined. The study area was Walker Branch Watershed (WBW) in eastern Tennessee. The presence of a significant quantity of fly ash and dispersed soil particles on upward-facing leaf and flat surfaces suggested sedimentation to be a major mechanism of dry deposition to upper canopy elements. The agreement for deposition rates measured to inert, flat surfaces and to leaves was good for Cd, SO/sub 4//sup =/, Zn, and Mn but poor for Pb. The precipitation concentrations of H/sup +/, Pb, Mn, and SO/sub 4//sup =/ reached maximum values during the summer months. About 90% of the wet deposition of Pb and SO/sub 4//sup =/ was attributed to scavenging by in-cloud processes while for Cd and Mn, removal by in-cloud scavenging accounted for 60 to 70% of the deposition. The interception of incoming rain by the forest canopy resulted in a net increase in the concentrations of Cd, Mn, Pb, Zn, and SO/sub 4//sup =/ but a net decrease in the concentration of H/sup +/. The source of these elements in the forest canopy was primarily dry deposited aerosols for Pb, primarily internal plant leaching for Mn, Cd, and Zn, and an approximately equal combination of the two for SO/sub 4//sup =/. Significant fractions of the total annual elemental flux to the forest floor in a representative chestnut oak stand were attributable to external sources for Pb (99%), Zn (44%), Cd (42%), SO/sub 4//sup =/ (39%), and Mn (14%), the remainder being related to internal element cycling mechanisms. On an annual scale the dry deposition process constituted a significant fraction of the total atmospheric input. (ERB)
CVD diamond deposition onto dental burs
International Nuclear Information System (INIS)
Ali, N.; Sein, H.
2001-01-01
A hot-filament chemical vapor deposition (HFCVD) system has been modified to enable non-planar substrates, such as metallic wires and dental burs, to be uniformly coated with thin polycrystalline diamond films. Initially, diamond deposition was carried out on titanium and tantalum wires in order to test and optimize the system. High growth rates of the order of approx. 8 /hr were obtained when depositing diamond on titanium wires using the vertical filament arrangement. However, lower growth rates of the order of 4-5meu m/hr were obtained with diamond deposition on tantalum wires. To extend the work towards a practical biomedical application tungsten carbide dental burs were coated with diamond films. The as-grown films were found to be polycrystalline and uniform over the cutting tip. Finally, the costs relating to diamond CVD onto dental burs have been presented in this paper. The costs relating to coating different number of burs at a time and the effect of film thickness on costs have been included in this investigation. (author)
Goring, S. J.; McLachlan, J. S.; Jackson, S. T.; Blaauw, M.; Christen, J.; Marlon, J.; Blois, J.; Williams, J. W.
2011-12-01
PalEON is a multidisciplinary project that combines paleo and modern ecological data with state-of-the-art statistical and modelling tools to examine the interactions between climate, fire and vegetation during the past two millennia in the northeastern United States. A fundamental challenge for PalEON (and paleo research more broadly) is to improve age modelling to yield more accurate sediment-core chronologies. To address this challenge, we assessed sedimentation rates and their controls for 218 lakes and mires in the northeastern U.S. Sedimentation rates (yr/cm) were calculated from age-depth models, which were obtained from the Neotoma database (www.neotomadb.org) and other contributed pollen records. The age models were recalibrated to IntCal09 and augmented in some cases using biostratigraphic markers (Picea decline, 16 kcal BP - 10.5 kcal BP; Quercus rise, 12 - 9.1 kcal BP; and Alnus decline, 11.5 - 10.6 kcal BP) as described in Blois et al. (2011). Relationships between sedimentation rates and sediment age, site longitude, and depositional environment (lacustrine or mire) are significant but weak. There are clear and significant links between variations in the NGRIP record of δ18O and sedimentation in mires across the PalEON region, but no links to lacustrine sedimentation rates. This result indicates that super-regional climatic control of primary productivity, and thus autochthonic sediment deposition, dominates in mires while deposition in lacustrine basins may be driven primarily by local and regional factors including watershed size, surficial materials,and regional vegetation. The shape of the gamma probability functions that best describe sedimentation rate distributions are calculated and presented here for use as priors in Bayesian age modelling applications such as BACON (Blaauw and Christen, in press). Future applications of this research are also discussed.
S-shaped magnetic macroparticle filter for cathodic arc deposition
International Nuclear Information System (INIS)
Anders, S.; Anders, A.; Dickinson, M.R.; MacGill, R.A.; Brown, I.G.
1996-01-01
A new magnetic macroparticle filter design consisting of two 90 o filters forming an S-shape is described. Transport properties of this S-filter are investigated using Langmuir and deposition probes. It is shown that filter efficiency is product of the efficiencies of two 90 o filters and the deposition rate is still acceptably high to perform thin film deposition. Films of amorphous hard carbon have been deposited using a 90 o filter and the S-filter, and macroparticle content of the films are compared
High quality antireflective ZnS thin films prepared by chemical bath deposition
International Nuclear Information System (INIS)
Tec-Yam, S.; Rojas, J.; Rejón, V.; Oliva, A.I.
2012-01-01
Zinc sulfide (ZnS) thin films for antireflective applications were deposited on glass substrates by chemical bath deposition (CBD). Chemical analysis of the soluble species permits to predict the optimal pH conditions to obtain high quality ZnS films. For the CBD, the ZnCl 2 , NH 4 NO 3 , and CS(NH 2 ) 2 were fixed components, whereas the KOH concentration was varied from 0.8 to 1.4 M. Groups of samples with deposition times from 60 to 120 min were prepared in a bath with magnetic agitation and heated at 90 °C. ZnS films obtained from optimal KOH concentrations of 0.9 M and 1.0 M exhibited high transparency, homogeneity, adherence, and crystalline. The ZnS films presented a band gap energy of 3.84 eV, an atomic Zn:S stoichiometry ratio of 49:51, a transmittance above 85% in the 300–800 nm wavelength range, and a reflectance below 25% in the UV–Vis range. X-ray diffraction analysis revealed a cubic structure in the (111) orientation for the films. The thickness of the films was tuned between 60 nm and 135 nm by controlling the deposition time and KOH concentration. The incorporation of the CBD-ZnS films into ITO/ZnS/CdS/CdTe and glass/Mo/ZnS heterostructures as antireflective layer confirms their high optical quality. -- Highlights: ► High quality ZnS thin films were prepared by chemical bath deposition (CBD). ► Better CBD-ZnS films were achieved by using 0.9 M-KOH concentration. ► Reduction in the reflectance was obtained for ZnS films used as buffer layers.
Numerical study on increasing mass flow ratio by energy deposition of high frequency pulsed laser
International Nuclear Information System (INIS)
Wang Diankai; Hong Yanji; Li Qian
2013-01-01
The mass flow ratio (MFR) of air breathing ramjet inlet would be decreased, when the Mach number is lower than the designed value. High frequency pulsed laser energy was deposited upstream of the cowl lip to reflect the stream so as to increase the MFR. When the Mach number of the flow was 5.0, and the static pressure and temperature of the flow were 2 551.6 Pa and 116.7 K, respectively, two-dimensional non-stationary compressible RANS equations were solved with upwind format to study the mechanisms of increasing MFR by high frequency pulsed laser energy deposition. The laser deposition frequency was 100 kHz and the average power was 500 W. The crossing point of the first forebody oblique shock and extension line of cowl lip was selected as the expected point. Then the deposition position was optimized by searching near the expected point. The results indicate that with the optimization of laser energy deposition position, the MFR would be increased from 63% to 97%. The potential value of increasing MFR by high frequency pulsed laser energy deposition was proved. The method for selection of the energy deposition position was also presented. (authors)
Evolution of high tooth replacement rates in sauropod dinosaurs.
D'Emic, Michael D; Whitlock, John A; Smith, Kathlyn M; Fisher, Daniel C; Wilson, Jeffrey A
2013-01-01
Tooth replacement rate can be calculated in extinct animals by counting incremental lines of deposition in tooth dentin. Calculating this rate in several taxa allows for the study of the evolution of tooth replacement rate. Sauropod dinosaurs, the largest terrestrial animals that ever evolved, exhibited a diversity of tooth sizes and shapes, but little is known about their tooth replacement rates. We present tooth replacement rate, formation time, crown volume, total dentition volume, and enamel thickness for two coexisting but distantly related and morphologically disparate sauropod dinosaurs Camarasaurus and Diplodocus. Individual tooth formation time was determined by counting daily incremental lines in dentin. Tooth replacement rate is calculated as the difference between the number of days recorded in successive replacement teeth. Each tooth family in Camarasaurus has a maximum of three replacement teeth, whereas each Diplodocus tooth family has up to five. Tooth formation times are about 1.7 times longer in Camarasaurus than in Diplodocus (315 vs. 185 days). Average tooth replacement rate in Camarasaurus is about one tooth every 62 days versus about one tooth every 35 days in Diplodocus. Despite slower tooth replacement rates in Camarasaurus, the volumetric rate of Camarasaurus tooth replacement is 10 times faster than in Diplodocus because of its substantially greater tooth volumes. A novel method to estimate replacement rate was developed and applied to several other sauropodomorphs that we were not able to thin section. Differences in tooth replacement rate among sauropodomorphs likely reflect disparate feeding strategies and/or food choices, which would have facilitated the coexistence of these gigantic herbivores in one ecosystem. Early neosauropods are characterized by high tooth replacement rates (despite their large tooth size), and derived titanosaurs and diplodocoids independently evolved the highest known tooth replacement rates among archosaurs.
Evolution of high tooth replacement rates in sauropod dinosaurs.
Directory of Open Access Journals (Sweden)
Michael D D'Emic
Full Text Available BACKGROUND: Tooth replacement rate can be calculated in extinct animals by counting incremental lines of deposition in tooth dentin. Calculating this rate in several taxa allows for the study of the evolution of tooth replacement rate. Sauropod dinosaurs, the largest terrestrial animals that ever evolved, exhibited a diversity of tooth sizes and shapes, but little is known about their tooth replacement rates. METHODOLOGY/PRINCIPAL FINDINGS: We present tooth replacement rate, formation time, crown volume, total dentition volume, and enamel thickness for two coexisting but distantly related and morphologically disparate sauropod dinosaurs Camarasaurus and Diplodocus. Individual tooth formation time was determined by counting daily incremental lines in dentin. Tooth replacement rate is calculated as the difference between the number of days recorded in successive replacement teeth. Each tooth family in Camarasaurus has a maximum of three replacement teeth, whereas each Diplodocus tooth family has up to five. Tooth formation times are about 1.7 times longer in Camarasaurus than in Diplodocus (315 vs. 185 days. Average tooth replacement rate in Camarasaurus is about one tooth every 62 days versus about one tooth every 35 days in Diplodocus. Despite slower tooth replacement rates in Camarasaurus, the volumetric rate of Camarasaurus tooth replacement is 10 times faster than in Diplodocus because of its substantially greater tooth volumes. A novel method to estimate replacement rate was developed and applied to several other sauropodomorphs that we were not able to thin section. CONCLUSIONS/SIGNIFICANCE: Differences in tooth replacement rate among sauropodomorphs likely reflect disparate feeding strategies and/or food choices, which would have facilitated the coexistence of these gigantic herbivores in one ecosystem. Early neosauropods are characterized by high tooth replacement rates (despite their large tooth size, and derived titanosaurs and
Energy Technology Data Exchange (ETDEWEB)
Amor, Sana Ben, E-mail: sana.benamor1@gmail.com [Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif (Tunisia); University of Applied Medical Sciences of Hafr El Baten (Saudi Arabia); Meddeb, Hosny; Daik, Ridha; Othman, Afef Ben; Slama, Sonia Ben; Dimassi, Wissem; Ezzaouia, Hatem [Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif (Tunisia)
2016-01-01
Graphical abstract: At high annealing temperatures, many atoms do not suffer the attraction of surface species due to the thermal agitation and consequently few atoms are adsorbed. As the temperature is lowered the adsorption is more efficient to the point that is no more atoms in the gas phase. Indeed at relatively low temperatures, the atoms have too little energy to escape from the surface or even to vibrate against it. They lost their degree of freedom in the direction perpendicular to the surface. But this does not prevent the atoms to diffuse along the surface. As a result, the layer's thickness decrease with increasing the annealing temperature. - Highlights: The results extracted from this work are: • The post-deposition thermal treatment improves the crystallinity the film at moderate temperature (500 °C). • The higher annealing temperature can lead to decrease the silicon–hydrogen bonds and increase the Si–Si bonds. • Moderate annealing temperature (700 °C) seems to be crucial for obtaining high minority carrier life times. • Hydrogen effusion phenomenon start occurring at 500–550 °C and get worsen at 900 °C. - Abstract: In this paper, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited on mono-crystalline silicon substrate by plasma enhanced chemical vapor deposition (PECVD) under different hydrogen flow rates followed by a thermal treatment in an infrared furnace at different temperature ranging from 300 to 900 °C. The investigated structural, morphological and optoelectronic properties of samples were found to be strongly dependent on the annealing temperature. Raman spectroscopy revealed that nc-Si:H films contain crystalline, amorphous and mixed structures as well. We find that post-deposition thermal treatment may lead to a tendency for structural improvement and a decrease of the disorder in the film network at moderate temperature under 500 °C. As for annealing at higher temperature up to 900
Ozdemir, Ozan C.; Widener, Christian A.; Carter, Michael J.; Johnson, Kyle W.
2017-10-01
As the industrial application of the cold spray technology grows, the need to optimize both the cost and the quality of the process grows with it. Parameter selection techniques available today require the use of a coupled system of equations to be solved to involve the losses due to particle loading in the gas stream. Such analyses cause a significant increase in the computational time in comparison with calculations with isentropic flow assumptions. In cold spray operations, engineers and operators may, therefore, neglect the effects of particle loading to simplify the multiparameter optimization process. In this study, two-way coupled (particle-fluid) quasi-one-dimensional fluid dynamics simulations are used to test the particle loading effects under many potential cold spray scenarios. Output of the simulations is statistically analyzed to build regression models that estimate the changes in particle impact velocity and temperature due to particle loading. This approach eases particle loading optimization for more complete analysis on deposition cost and time. The model was validated both numerically and experimentally. Further numerical analyses were completed to test the particle loading capacity and limitations of a nozzle with a commonly used throat size. Additional experimentation helped document the physical limitations to high-rate deposition.
Liu, Jian; Banis, Mohammad N; Sun, Qian; Lushington, Andrew; Li, Ruying; Sham, Tsun-Kong; Sun, Xueliang
2014-10-08
Atomic layer deposition is successfully applied to synthesize lithium iron phosphate in a layer-by-layer manner by using self-limiting surface reactions. The lithium iron phosphate exhibits high power density, excellent rate capability, and ultra-long lifetime, showing great potential for vehicular lithium batteries and 3D all-solid-state microbatteries. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
High population increase rates.
1991-09-01
In addition to its economic and ethnic difficulties, the USSR faces several pressing demographic problems, including high population increase rates in several of its constituent republics. It has now become clear that although the country's rigid centralized planning succeeded in covering the basic needs of people, it did not lead to welfare growth. Since the 1970s, the Soviet economy has remained sluggish, which as led to increase in the death and birth rates. Furthermore, the ideology that held that demography could be entirely controlled by the country's political and economic system is contradicted by current Soviet reality, which shows that religion and ethnicity also play a significant role in demographic dynamics. Currently, Soviet republics fall under 2 categories--areas with high or low natural population increase rates. Republics with low rates consist of Christian populations (Armenia, Moldavia, Georgia, Byelorussia, Russia, Lithuania, Estonia, Latvia, Ukraine), while republics with high rates are Muslim (Tadzhikistan, Uzbekistan, Turkmenistan, Kirgizia, Azerbaijan Kazakhstan). The later group has natural increase rates as high as 3.3%. Although the USSR as a whole is not considered a developing country, the later group of republics fit the description of the UNFPA's priority list. Another serious demographic issue facing the USSR is its extremely high rate of abortion. This is especially true in the republics of low birth rates, where up to 60% of all pregnancies are terminated by induced abortions. Up to 1/5 of the USSR's annual health care budget is spent on clinical abortions -- money which could be better spent on the production of contraceptives. Along with the recent political and economic changes, the USSR is now eager to deal with its demographic problems.
Atomic layer deposition for high-efficiency crystalline silicon solar cells
Macco, B.; van de Loo, B.W.H.; Kessels, W.M.M.; Bachmann, J.
2017-01-01
This chapter illustrates that Atomic Layer Deposition (ALD) is in fact an enabler of novel high-efficiency Si solar cells, owing to its merits such as a high material quality, precise thickness control, and the ability to prepare film stacks in a well-controlled way. It gives an overview of the
Application of high rate magnetron sputtering to the fabrication of A-15 compounds
International Nuclear Information System (INIS)
Kampwirth, R.T.; Hafstrom, J.W.; Wu, C.T.
1976-01-01
High quality Nb 3 Sn films have been fabricated using a recently developed magnetron sputtering process capable of deposition rates approaching 1 μm/min. at sputtering voltages less than 500 V and power levels of about 5 KW. Low sputtering voltages allow more complete thermalization at lower pressures of the material condensing on the substrate which can improve long range order. Transition temperatures of up to 18.3 0 K, J/sub c/(O)'s of 15 x 10 6 A/cm 2 and Hc 2 as high as 240 kOe have been achieved in 1-3 μm films deposited from a Nb 3 Sn reacted powder target with substrate temperatures between 600 and 800 0 C. The films exhibit smooth surfaces and, generally, a [200] preferred orientation. The growth of the film is columnar in nature. The sputtering parameters, substrate material and temperature will be related to film structure T/sub c/ and J/sub c/(H,T) and the Nb/Sn ratio as determined by Rutherford backscattering
Properties of DLC coatings deposited by dc and dc with superimposed pulsed vacuum arc
International Nuclear Information System (INIS)
Zavaleyev, V.; Walkowicz, J.; Aksyonov, D.S.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel'nitskij, V.E.
2014-01-01
Comparative studies of the structure, mechanical and tribological properties of DLC coatings deposited in DC and DC with superimposed high current pulse modes of operation vacuum-arc plasma source with the graphite cathode are presented. Imposition the pulses of high current on DC vacuum-arc discharge allows both increase the deposition rate of DLC coating and reduce the residual compressive stress in the coatings what promotes substantial improvement the adhesion to the substrate. Effect of vacuum arc plasma filtration with Venetian blind filter on the deposition rate and tribological characteristics of the coatings analyzed.
Energy Technology Data Exchange (ETDEWEB)
Feijoo, P.C., E-mail: pedronska@fis.ucm.es [Dpto. Física Aplicada III (Electricidad y Electrónica), Universidad Complutense de Madrid, Fac. de CC. Físicas. Av/Complutense S/N, E-28040 Madrid (Spain); Pampillón, M.A.; San Andrés, E. [Dpto. Física Aplicada III (Electricidad y Electrónica), Universidad Complutense de Madrid, Fac. de CC. Físicas. Av/Complutense S/N, E-28040 Madrid (Spain); Fierro, J.L.G. [Instituto de Catálisis y Petroleoquímica, Consejo Superior de Investigaciones Científicas, C/Marie Curie 2, E-28049 Cantoblanco (Spain)
2015-10-30
In this work we use the high pressure sputtering technique to deposit the high permittivity dielectric gadolinium scandate on silicon substrates. This nonconventional deposition technique prevents substrate damage and allows for growth of ternary compounds with controlled composition. Two different approaches were assessed: the first one consists of depositing the material directly from a stoichiometric GdScO{sub 3} target; in the second one, we anneal a nano-laminate of < 0.5 nm thick Gd{sub 2}O{sub 3} and Sc{sub 2}O{sub 3} films in order to control the composition of the scandate. Metal–insulator–semiconductor capacitors were fabricated with platinum gates for electrical characterization. Accordingly, we grew a Gd-rich Gd{sub 2−x}Sc{sub x}O{sub 3} film that, in spite of higher leakage currents, presents a better effective relative permittivity of 21 and lower density of defects. - Highlights: • GdScO is deposited on Si as a high permittivity dielectric by two procedures. • Films sputtered from GdScO{sub 3} target are Sc-rich and present thick interface SiO{sub x}. • Gd-rich GdScO is obtained from a nano-laminate sputtered from Sc{sub 2}O{sub 3} and Gd{sub 2}O{sub 3}. • Gd{sub 1.8}Sc{sub 0.2}O{sub 3} shows good effective permittivity and electrical properties.
Yang, Bo; Wang, Songwei; Wu, Juhao
2018-01-01
High-brightness X-ray free-electron lasers (FELs) are perceived as fourth-generation light sources providing unprecedented capabilities for frontier scientific researches in many fields. Thin crystals are important to generate coherent seeds in the self-seeding configuration, provide precise spectral measurements, and split X-ray FEL pulses, etc. In all of these applications a high-intensity X-ray FEL pulse impinges on the thin crystal and deposits a certain amount of heat load, potentially impairing the performance. In the present paper, transient thermal stress wave and vibrational analyses as well as transient thermal analysis are carried out to address the thermomechanical issues for thin diamond crystals, especially under high-repetition-rate operation of an X-ray FEL. The material properties at elevated temperatures are considered. It is shown that, for a typical FEL pulse depositing tens of microjoules energy over a spot of tens of micrometers in radius, the stress wave emission is completed on the tens of nanoseconds scale. The amount of kinetic energy converted from a FEL pulse can reach up to ∼10 nJ depending on the layer thickness. Natural frequencies of a diamond plate are also computed. The potential vibrational amplitude is estimated as a function of frequency. Due to the decreasing heat conductivity with increasing temperature, a runaway temperature rise is predicted for high repetition rates where the temperature rises abruptly after ratcheting up to a point of trivial heat damping rate relative to heat deposition rate.
Studies on the high electronic energy deposition in polyaniline thin films
International Nuclear Information System (INIS)
Deshpande, N.G.; Gudage, Y.G.; Vyas, J.C.; Singh, F.; Sharma, Ramphal
2008-01-01
We report here the physico-chemical changes brought about by high electronic energy deposition of gold ions in HCl doped polyaniline (PANI) thin films. PANI thin films were synthesized by in situ polymerization technique. The as-synthesized PANI thin films of thickness 160 nm were irradiated using Au 7+ ion of 100 MeV energy at different fluences, namely, 5 x 10 11 ions/cm 2 and 5 x 10 12 ions/cm 2 , respectively. A significant change was seen after irradiation in electrical and photo conductivity, which may be related to increased carrier concentration, and structural modifications in the polymer film. In addition, the high electronic energy deposition showed other effects like cross-linking of polymer chains, bond breaking and creation of defect sites. AFM observations revealed mountainous type features in all (before and after irradiation) PANI samples. The average size (diameter) and density of such mountainous clusters were found to be related with the ion fluence. The AFM profiles also showed change in the surface roughness of the films with respect to irradiation, which is one of the peculiarity of the high electronic energy deposition technique
Market Discipline and Deposit Insurance
Peresetsky, Anatoly
2008-01-01
The paper examines Russian banks’ household deposit interest rates for the transition period of setting up the deposit insurance system. Monthly observations of Russian banks’ interest rates and balance sheets are used in a fixed effects panel data model. It is shown market discipline has been significantly diminished after switching to the deposit insurance.
High temperature oxidation and corrosion in marine environments of thermal spray deposited coatings
International Nuclear Information System (INIS)
Chaliampalias, D.; Vourlias, G.; Pavlidou, E.; Stergioudis, G.; Skolianos, S.; Chrissafis, K.
2008-01-01
Flame spraying is a widely used technique for depositing a great variety of materials in order to enforce the mechanical or the anticorrosion characteristics of the substrate. Its high rate application is due to the rapidity of the process, its effectiveness and its low cost. In this work, flame-sprayed Al coatings are deposited on low carbon steels in order to enhance their anticorrosion performance. The main adhesion mechanism of the coating is mechanical anchorage, which can provide the necessary protection to steel used in several industrial and constructive applications. To evaluate the corrosion resistance of the coating, the as-coated samples are subjected in a salt spray chamber and in elevated temperature environments. The examination and characterization of the corroded samples is done by scanning electron microscopy and X-ray diffraction analysis. The as-formed coatings are extremely rough and have a lamellic homogeneous morphology. It is also found that Al coatings provide better protection in marine atmospheres, while at elevated temperatures a thick oxide layer is formed, which can delaminate after long oxidation periods due to its low adherence to the underlying coating, thus eliminating the substrate protection
Industrial implementation of plasma deposition using the expanding thermal plasma technique
Sanden, van de M.C.M.; Oever, van den P.J.; Creatore, M.; Schaepkens, M.; Miebach, T.; Iacovangelo, C.D.; Bosch, R.C.M.; Bijker, M.D.; Evers, M.F.J.; Schram, D.C.; Kessels, W.M.M.
2004-01-01
Two successful industrial implementations of the expanding thermal plasma setup, a novel plasma source, obtaining high deposition rate are discussed. The Ar/O2/hexamethyldisiloxane and Ar/O2/octamethyl-cyclosiloxane-fed expanding thermal plasma setup is used to deposit scratch resistant silicone
High Rate Digital Demodulator ASIC
Ghuman, Parminder; Sheikh, Salman; Koubek, Steve; Hoy, Scott; Gray, Andrew
1998-01-01
The architecture of High Rate (600 Mega-bits per second) Digital Demodulator (HRDD) ASIC capable of demodulating BPSK and QPSK modulated data is presented in this paper. The advantages of all-digital processing include increased flexibility and reliability with reduced reproduction costs. Conventional serial digital processing would require high processing rates necessitating a hardware implementation in other than CMOS technology such as Gallium Arsenide (GaAs) which has high cost and power requirements. It is more desirable to use CMOS technology with its lower power requirements and higher gate density. However, digital demodulation of high data rates in CMOS requires parallel algorithms to process the sampled data at a rate lower than the data rate. The parallel processing algorithms described here were developed jointly by NASA's Goddard Space Flight Center (GSFC) and the Jet Propulsion Laboratory (JPL). The resulting all-digital receiver has the capability to demodulate BPSK, QPSK, OQPSK, and DQPSK at data rates in excess of 300 Mega-bits per second (Mbps) per channel. This paper will provide an overview of the parallel architecture and features of the HRDR ASIC. In addition, this paper will provide an over-view of the implementation of the hardware architectures used to create flexibility over conventional high rate analog or hybrid receivers. This flexibility includes a wide range of data rates, modulation schemes, and operating environments. In conclusion it will be shown how this high rate digital demodulator can be used with an off-the-shelf A/D and a flexible analog front end, both of which are numerically computer controlled, to produce a very flexible, low cost high rate digital receiver.
International Nuclear Information System (INIS)
Krauss, A.R.; Auciello, O.
1992-01-01
Ion beam sputter-deposition is a technique currently used by many groups to produce single and multicomponent thin films. This technique provides several advantages over other deposition methods, which include the capability for yielding higher film density, accurate stoichiometry control, and smooth surfaces. However, the relatively high kinetic energies associated with ion beam sputtering also lead to difficulties if the process is not properly controlled. Computer simulations have been performed to determine net deposition rates, as well as the secondary erosion, lattice damage, and gas implantation in the films, associated with primary ions scattered from elemental Y, Ba and Cu targets used to produce high temperature superconducting Y-Ba-Cu-O films. The simulations were performed using the TRIM code for different ion masses and kinetic energies, and different deposition geometries. Results are presented for primary beams of Ar + , Kr + and Xe + incident on Ba and Cu targets at 0 degrees and 45 degrees with respect to the surface normal, with the substrate positioned at 0 degrees and 45 degrees. The calculations indicate that the target composition, mass and kinetic energy of the primary beam, angle of incidence on the target, and position and orientation of the substrate affect the film damage and trapped primary beam gas by up to 5 orders of magnitude
Late Holocene stratigraphy of coastal deposits between Auckland and Dunedin, New Zealand
International Nuclear Information System (INIS)
McFadgen, B.G.
1985-01-01
Three chronostratigraphic units based on accumulative deposits and their respective soils are proposed for late Holocene coastal deposits between Auckland and Dunedin, New Zealand: Tamatean Chronozone (c. 1,800 to 450 years BP), Ohuan Chronozone (c. 450 to 150 years BP), and Hoatan Chronozone (c. 150 years to present day). The chronozones represent depositional episodes each consisting of two phases: a high rate of deposition (unstable phase), followed by a low rate of deposition and soil formation (stable phase). Vegetation on soils formed during the stable phases is inferred principally from landsnails recovered from archaeological sites. Forest on Tamatean soil (600 to 450 years BP) advanced almost to the coast in the Manawatu, the southeast Wairarapa, and on the East Coast. Sediment thickness measured at sections along the eastern North Island coast show that rates of deposition during unstable phases have decreased during the last 650 years. The depositional episodes appear to be unrelated to sea level changes, tectonic activity, volcanic eruptions or cultural influence. Unstable phases appear to correlate with times of high temperatures, and stable phases with time of low temperatures; it is suggested that the episodes may be related to changes in the frequency of tropical and extratropical cyclones. Inferred climate during unstable phases is windy and dry, and during stable phases, less windy and moist
FAST TRACK COMMUNICATION: Deposition of amino-rich thin films by RF magnetron sputtering of nylon
Kylián, O.; Hanuš, J.; Choukourov, A.; Kousal, J.; Slavínská, D.; Biederman, H.
2009-07-01
RF magnetron sputtering of a nylon target in different gas mixtures was studied in order to evaluate the capability of this process to deposit amino-rich coatings needed in a wide range of biomedical applications. It has been demonstrated that both the deposition rate of the coatings and the surface density of primary amino groups are strongly linked with working gas mixture composition. From this point of view, a sufficiently high deposition rate as well as the highest amine efficiency reaching a NH2/C value of 18% was observed in the N2/H2 discharge, which leads to the surface exhibiting a high rate of protein adsorption.
Directory of Open Access Journals (Sweden)
Mohamed Shuaib Mohamed Saheed
2014-01-01
Full Text Available The paper reported the investigation of the substrate preparation technique involving deposition of iron catalyst by electron beam evaporation and ferrocene vaporization in order to produce vertically aligned multiwalled carbon nanotubes array needed for fabrication of tailored devices. Prior to the growth at 700°C in ethylene, silicon dioxide coated silicon substrate was prepared by depositing alumina followed by iron using two different methods as described earlier. Characterization analysis revealed that aligned multiwalled carbon nanotubes array of 107.9 µm thickness grown by thermal chemical vapor deposition technique can only be achieved for the sample with iron deposited using ferrocene vaporization. The thick layer of partially oxidized iron film can prevent the deactivation of catalyst and thus is able to sustain the growth. It also increases the rate of permeation of the hydrocarbon gas into the catalyst particles and prevents agglomeration at the growth temperature. Combination of alumina-iron layer provides an efficient growth of high density multiwalled carbon nanotubes array with the steady growth rate of 3.6 µm per minute for the first 12 minutes and dropped by half after 40 minutes. Thicker and uniform iron catalyst film obtained from ferrocene vaporization is attributed to the multidirectional deposition of particles in the gaseous form.
Growth of highly oriented carbon nanotubes by plasma-enhanced hot filament chemical vapor deposition
Energy Technology Data Exchange (ETDEWEB)
Huang, Z.P.; Xu, J.W.; Ren, Z.F.; Wang, J.H. [Materials Synthesis Laboratory, Departments of Physics and Chemistry, and Center for Advanced Photonic and Electronic Materials (CAPEM), State University of New York at Buffalo, Buffalo, New York 14260 (United States); Siegal, M.P.; Provencio, P.N. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States)
1998-12-01
Highly oriented, multiwalled carbon nanotubes were grown on polished polycrystalline and single crystal nickel substrates by plasma enhanced hot filament chemical vapor deposition at temperatures below 666 {degree}C. The carbon nanotubes range from 10 to 500 nm in diameter and 0.1 to 50 {mu}m in length depending on growth conditions. Acetylene is used as the carbon source for the growth of the carbon nanotubes and ammonia is used for dilution gas and catalysis. The plasma intensity, acetylene to ammonia gas ratio, and their flow rates, etc. affect the diameters and uniformity of the carbon nanotubes. {copyright} {ital 1998 American Institute of Physics.}
International Nuclear Information System (INIS)
Ootsuka, Kae; Togami, Izumi; Kitagawa, Takahiro
1996-01-01
MR imaging is a useful non-invasive technique to detect iron deposits in many organs, but it is difficult to evaluate quantitatively. This study was performed to determine the possibility whether T2 relaxation rate (1/T2) could quantify iron deposits in the reticuloendothelial system (liver, spleen and bone marrow) of 11 patients and four normal volunteers. A moderate correlation was obtained between T2-relaxation rate and the serum ferritin level. These results suggest that T2-relaxation rate may provide useful information for the repeated quantitative evaluation of patients with iron-overload-syndromes. (author)
Deposition of silicon oxynitride at room temperature by Inductively Coupled Plasma-CVD
Energy Technology Data Exchange (ETDEWEB)
Zambom, Luis da Silva [MPCE-Faculdade de Tecnologia de Sao Paulo - CEETEPS, Pca Coronel Fernando Prestes, 30, Sao Paulo - CEP 01124-060 (Brazil)]. E-mail: zambom@lsi.usp.br; Verdonck, Patrick [PSI-LSI-Escola Politecnica da Universidade de Sao Paulo (Brazil)]. E-mail: patrick@lsi.usp.br
2006-10-25
Oxynitride thin films are used in important optical applications and as gate dielectric for MOS devices. Their traditional deposition processes have the drawbacks that high temperatures are needed, high mechanical stresses are induced and the deposition rate is low. Plasma assisted processes may alleviate these problems. In this study, oxynitride films were deposited at room temperature through the chemical reaction of silane, nitrogen and nitrous oxide (N{sub 2}O), in a conventional LPCVD furnace, which was modified into a high density Inductively Coupled Plasma (ICP) reactor. Deposition rates increased with applied coil power and were never lower than 10 nm/min, quite high for room temperature depositions. The films' refractive indexes and FTIR spectra indicate that for processes with low N{sub 2}O gas concentrations, when mixed together with N{sub 2} and SiH{sub 4}, nitrogen was incorporated in the film. This incorporation increased the resistivity, which was up to 70 G{omega} cm, increased the refractive index, from approximately 1.47 to approximately 1.50, and decreased the dielectric constant of these films, which varied in the 4-14 range. These characteristics are adequate for electric applications e.g. for TFT fabrication on glass or polymers which can not stand high temperature steps.
Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition
Kim, Gwihyun; Park, Seran; Shin, Hyunsu; Song, Seungho; Oh, Hoon-Jung; Ko, Dae Hong; Choi, Jung-Il; Baik, Seung Jae
2017-12-01
Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation of mass-transport and that of substrate temperature. The opposite trend of these variations would be the key consideration in the development of uniform deposition process. Another inherent feature of AP PECVD is confined plasma discharge, from which volume power density concept is derived as a key parameter for the control of deposition rate. We investigated deposition rate as a function of volume power density, gas flux, source gas partial pressure, hydrogen partial pressure, plasma source frequency, and substrate temperature; and derived a design guideline of deposition tool and process development in terms of deposition rate and uniformity.
Evaluation of Hydrogen Cracking in Weld Metal Deposited using Cellulosic-Coated Electrodes
2009-06-16
Cellulosic-coated electrodes (primarily AWS EXX10-type) are traditionally used for "stovepipe" welding of pipelines because they are well suited for deposition of pipeline girth welds and are capable of high deposition rates when welding downhill. De...
High-speed deposition of titanium carbide coatings by laser-assisted metal–organic CVD
Energy Technology Data Exchange (ETDEWEB)
Gong, Yansheng [Faculty of Materials Science and Chemistry, China University of Geosciences, Wuhan 430074 (China); Tu, Rong, E-mail: turong@whut.edu.cn [State Key Laboratory of Advanced Technology for Material Synthesis and Processing, Wuhan University of Technology, Wuhan 430070 (China); Goto, Takashi [Institute for Materials Research, Tohoku University, Aoba-ku, 2-1-1 Katahira, Sendai 980-8577 (Japan)
2013-08-01
Graphical abstract: - Highlights: • A semiconductor laser was first used to prepare wide-area LCVD-TiC{sub x} coatings. • The effect of laser power for the deposition of TiC{sub x} coatings was discussed. • TiC{sub x} coatings showed a columnar cross section and a dense surface texture. • TiC{sub x} coatings had a 1–4 order lower laser density than those of previous reports. • This study gives the possibility of LCVD applying on the preparation of TiC{sub x} coating. - Abstract: A semiconductor laser-assisted chemical vapor deposition (LCVD) of titanium carbide (TiC{sub x}) coatings on Al{sub 2}O{sub 3} substrate using tetrakis (diethylamido) titanium (TDEAT) and C{sub 2}H{sub 2} as source materials were investigated. The influences of laser power (P{sub L}) and pre-heating temperature (T{sub pre}) on the microstructure and deposition rate of TiC{sub x} coatings were examined. Single phase of TiC{sub x} coatings were obtained at P{sub L} = 100–200 W. TiC{sub x} coatings had a cauliflower-like surface and columnar cross section. TiC{sub x} coatings in the present study had the highest R{sub dep} (54 μm/h) at a relative low T{sub dep} than those of conventional CVD-TiC{sub x} coatings. The highest volume deposition rate (V{sub dep}) of TiC{sub x} coatings was about 4.7 × 10{sup −12} m{sup 3} s{sup −1}, which had 3–10{sup 5} times larger deposition area and 1–4 order lower laser density than those of previous LCVD using CO{sub 2}, Nd:YAG and argon ion laser.
Self-limiting atomic layer deposition of conformal nanostructured silver films
International Nuclear Information System (INIS)
Golrokhi, Zahra; Chalker, Sophia; Sutcliffe, Christopher J.; Potter, Richard J.
2016-01-01
Graphical abstract: - Highlights: • We grow metallic silver by direct liquid injection thermal atomic layer deposition. • Highly conformal silver nanoparticle coatings on high aspect ratio surfaces. • An ALD temperature growth window between 123 and 128 °C is established. • ALD cycles provides sub nanometre control of silver growth. • Catalytic dehydrogenation ALD mechanism has been elucidated by in-situ QCM. - Abstract: The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for applications including anti-microbial surfaces, plasmonics, catalysts and sensors. While numerous techniques can produce silver nanoparticles, few are able to produce highly conformal coatings on high aspect ratio surfaces, together with sub-nanometre control and scalability. Here we develop a self-limiting atomic layer deposition (ALD) process for the deposition of conformal metallic silver nanoparticle films. The films have been deposited using direct liquid injection ALD with ((hexafluoroacetylacetonato)silver(I)(1,5-cyclooctadiene)) and propan-1-ol. An ALD temperature window between 123 and 128 °C is identified and within this range self-limiting growth is confirmed with a mass deposition rate of ∼17.5 ng/cm"2/cycle. The effects of temperature, precursor dose, co-reactant dose and cycle number on the deposition rate and on the properties of the films have been systematically investigated. Under self-limiting conditions, films are metallic silver with a nano-textured surface topography and nanoparticle size is dependent on the number of ALD cycles. The ALD reaction mechanisms have been elucidated using in-situ quartz crystal microbalance (QCM) measurements, showing chemisorption of the silver precursor, followed by heterogeneous catalytic dehydrogenation of the alcohol to form metallic silver and an aldehyde.
Ilmenite Nanotubes for High Stability and High Rate Sodium-Ion Battery Anodes.
Yu, Litao; Liu, Jun; Xu, Xijun; Zhang, Liguo; Hu, Renzong; Liu, Jiangwen; Ouyang, Liuzhang; Yang, Lichun; Zhu, Min
2017-05-23
To solve the problem of large volume change and low electronic conductivity of earth-abundant ilmenite used in rechargeable Na-ion batteries (SIBs), an anode of tiny ilmenite FeTiO 3 nanoparticle embedded carbon nanotubes (FTO⊂CNTs) has been successfully proposed. By introducing a TiO 2 shell on metal-organic framework (Fe-MOF) nanorods by sol-gel deposition and subsequent solid-state annealing treatment of these core-shell Fe-MOF@TiO 2 , such well-defined FTO⊂CNTs are obtained. The achieved FTO⊂CNT electrode has several distinct advantages including a hollow interior in the hybrid nanostructure, fully encapsulated ultrasmall electroactive units, flexible conductive carbon matrix, and stable solid electrolyte interface (SEI) of FTO in cycles. FTO⊂CNT electrodes present an excellent cycle stability (358.8 mA h g -1 after 200 cycles at 100 mA g -1 ) and remarkable rate capability (201.8 mA h g -1 at 5000 mA g -1 ) with a high Coulombic efficiency of approximately 99%. In addition, combined with the typical Na 3 V 2 (PO 4 ) 3 cathode to constitute full SIBs, the assembled FTO⊂CNT//Na 3 V 2 (PO 4 ) 3 batteries are also demonstrated with superior rate capability and a long cycle life.
High Yolk Testosterone Transfer Is Associated with an Increased Female Metabolic Rate.
Tschirren, Barbara; Ziegler, Ann-Kathrin; Canale, Cindy I; Okuliarová, Monika; Zeman, Michal; Giraudeau, Mathieu
2016-01-01
Yolk androgens of maternal origin are important mediators of prenatal maternal effects. Although in many species short-term benefits of exposure to high yolk androgen concentrations for the offspring have been observed, females differ substantially in the amount of androgens they transfer to their eggs. It suggests that costs for the offspring or the mother constrain the evolution of maternal hormone transfer. However, to date, the nature of these costs remains poorly understood. Unlike most previous work that focused on potential costs for the offspring, we here investigated whether high yolk testosterone transfer is associated with metabolic costs (i.e., a higher metabolic rate) for the mother. We show that Japanese quail (Coturnix japonica) females that deposit higher testosterone concentrations into their eggs have a higher resting metabolic rate. Because a higher metabolic rate is often associated with a shorter life span, this relationship may explain the negative association between yolk testosterone transfer and female longevity observed in the wild. Our results suggest that metabolic costs for the mother can balance the short-term benefits of yolk testosterone exposure for the offspring, thereby contributing to the maintenance of variation in maternal yolk hormone transfer in natural populations.
Energy Technology Data Exchange (ETDEWEB)
Sobajima, Yasushi; Higuchi, Takuya; Chantana, Jakapan; Toyama, Toshihiko; Sada, Chitose; Matsuda, Akihisa; Okamoto, Hiroaki [Graduate School of Engineering Science, Osaka University, Toyonaka City (Japan)
2010-04-15
Surface-heating phenomenon by the radiation from high density plasma during growth of microcrystalline silicon ({mu}c-Si:H) thin films at high rate (> 5 nm/sec) is one of the crucial issues to be solved for obtaining high quality intrinsic-layer material for solar cells. We have utilized an optical emission spectroscopy (OES) in the plasma to observe the time evolution of gas temperature during film growth as well as the film-growth rate under {mu}c-Si:H deposition conditions at high rate. Gas temperature has been successfully controlled by changing total flow rate of monosilane (SiH{sub 4})/hydrogen (H{sub 2}) gas mixture, leading to a drastic improvement of optoelectronic properties in the resulting {mu}c-Si:H. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
Energy Technology Data Exchange (ETDEWEB)
Romero, M F; Sanz, M M; Munoz, E [ISOM-Universidad Politecnica de Madrid (UPM). ETSIT, Madrid (Spain); Tanarro, I [Instituto de Estructura de la Materia, CSIC, Madrid (Spain); Jimenez, A, E-mail: itanarro@iem.cfmac.csic.e [Departamento Electronica, Escuela Politecnica Superior, Universidad de Alcala, Alcala de Henares, Madrid (Spain)
2010-12-15
In this work, silicon nitride thin films have been deposited by plasma enhanced chemical vapour deposition on both silicon samples and AlGaN/GaN high electron mobility transistors (HEMT) grown on sapphire substrates. Commercial parallel-plate RF plasma equipment has been used. During depositions, the dissociation rates of SiH{sub 4} and NH{sub 3} precursors and the formation of H{sub 2} and N{sub 2} have been analysed by mass spectrometry as a function of the NH{sub 3}/SiH{sub 4} flow ratio and the RF power applied to the plasma reactor. Afterwards, the properties of the films and the HEMT electrical characteristics have been studied. Plasma composition has been correlated with the SiN deposition rate, refractive index, H content and the final electric characteristics of the passivated transistors.
Integration of atomic layer deposited high-k dielectrics on GaSb via hydrogen plasma exposure
Directory of Open Access Journals (Sweden)
Laura B. Ruppalt
2014-12-01
Full Text Available In this letter we report the efficacy of a hydrogen plasma pretreatment for integrating atomic layer deposited (ALD high-k dielectric stacks with device-quality p-type GaSb(001 epitaxial layers. Molecular beam eptiaxy-grown GaSb surfaces were subjected to a 30 minute H2/Ar plasma treatment and subsequently removed to air. High-k HfO2 and Al2O3/HfO2 bilayer insulating films were then deposited via ALD and samples were processed into standard metal-oxide-semiconductor (MOS capacitors. The quality of the semiconductor/dielectric interface was probed by current-voltage and variable-frequency admittance measurements. Measurement results indicate that the H2-plamsa pretreatment leads to a low density of interface states nearly independent of the deposited dielectric material, suggesting that pre-deposition H2-plasma exposure, coupled with ALD of high-k dielectrics, may provide an effective means for achieving high-quality GaSb MOS structures for advanced Sb-based digital and analog electronics.
Structure and superconducting properties of Nb-Zr alloy films made by a high-rate sputtering
International Nuclear Information System (INIS)
Sekine, Hisashi; Inoue, Kiyoshi; Tachikawa, Kyoji
1978-01-01
Superconducting Nb-Zr alloy films have been prepared by a continuous high-rate sputtering on tantalum substrates. A deposition rate of 330 nm/min has been attained. The compositional profile in the Nb-Zr film is quite uniform and the film has nearly the same composition as that of the target. The films deposited in a pure argon atmosphere show a columnar structure grown perpendicular to the substrate. The grain size strongly depends on the substrate temperature. The phase transformations in the Nb-Zr film become more apparent and the structure becomes closer to the equilibrium state as the film is deposited in higher atmosphere pressures and/or at lower target voltages. The superconducting transition temperature T sub(c) of the films is about the same as that of bulk samples. The dependence of T sub(c) on the substrate temperature is explainable on the phase transformations in the film. Critical current density J sub(c) and its anisotropy is closely related to the grain structure of the film. Grain boundaries seem to act as the most predominant flux pinning centers in the films. Effects of oxygen in the sputtering atmosphere on the structure and superconducting properties of the Nb-Zr films have been also investigated. Oxygen significantly decreases the grain size of the film. Oxygen increases J sub(c) but decreases T sub(c) of the film. (auth.)
In-situ deposition of YBCO high-Tc superconducting thin films by MOCVD and PE-MOCVD
International Nuclear Information System (INIS)
Zhao, J.; Noh, D.W.; Chern, C.; Li, Y.Q.; Norris, P.E.; Kear, B.; Gallois, B.
1991-01-01
Metal-Organic Chemical Vapor Deposition (MOCVD) offers the advantages of a high degree of compositional control, adaptability for large scale production, and the potential for low temperature fabrication. The capability of operating at high oxygen partial pressure is particularly suitable for in situ formation of high temperature superconducting (HTSC) films. Yttrium barium copper oxide (YBCO) thin films having a sharp zero-resistance transition with T(sub c) greater than 90 K and J(sub c) of approximately 10(exp 4) A on YSZ have been prepared, in situ, at a substrate temperature of about 800 C. Moreover, the ability to form oxide films at low temperature is very desirable for device applications of HTSC materials. Such a process would permit the deposition of high quality HTSC films with a smooth surface on a variety of substrates. Highly c-axis oriented, dense, scratch resistant, superconducting YBCO thin films with mirror-like surfaces have been prepared, in situ, at a reduced substrate temperature as low as 570 C by a remote microwave-plasma enhanced metal-organic chemical vapor deposition (PE-MOCVD) process. Nitrous oxide was used as a reactant gas to generate active oxidizing species. This process, for the first time, allows the formation of YBCO thin films with the orthorhombic superconducting phase in the as-deposited state. The as-deposited films grown by PE-MOCVD show attainment of zero resistance at 72 K with a transition width of about 5 K. MOCVD was carried out in a commercial production scale reactor with the capability of uniform deposition over 100 sq cm per growth run. Preliminary results indicate that PE-MOCVD is a very attractive thin film deposition process for superconducting device technology
Preparation and characterization of thick metastable sputter deposits
International Nuclear Information System (INIS)
Allen, R.P.; Dahlgren, S.D.; Merz, M.D.
1975-01-01
High-rate dc supported-discharge sputtering techniques were developed and used to prepare 0.1 mm to 5.0 mm-thick deposits of a variety of metastable materials including amorphous alloys representing more than 15 different rare-earth-transition metal systems and a wide range of compositions and deposition conditions. The ability to prepare thick, homogeneous deposits has made it possible for the first time to investigate the structure, properties, and annealing behavior of these unique sputtered alloys using neutron diffraction, ultrasonic, and other experimental techniques that are difficult or impractical for thin films. More importantly, these characterization studies show that the structure and properties of the massive sputter deposits are independent of thickness and can be reproduced from deposit to deposit. Other advantages and applications of this metastable materials preparation technique include the possibility of varying structure and properties by control of the deposition parameters and the ability to deposit even reactive alloys with a very low impurity content
Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings
Harder, Bryan J.; Zhu, Dongming
2011-01-01
In order to generate advanced multilayer thermal and environmental protection systems, a new deposition process is needed to bridge the gap between conventional plasma spray, which produces relatively thick coatings on the order of 125-250 microns, and conventional vapor phase processes such as electron beam physical vapor deposition (EB-PVD) which are limited by relatively slow deposition rates, high investment costs, and coating material vapor pressure requirements. The use of Plasma Spray - Physical Vapor Deposition (PS-PVD) processing fills this gap and allows thin (deposited and multilayer coatings of less than 100 microns to be generated with the flexibility to tailor microstructures by changing processing conditions. Coatings of yttria-stabilized zirconia (YSZ) were applied to NiCrAlY bond coated superalloy substrates using the PS-PVD coater at NASA Glenn Research Center. A design-of-experiments was used to examine the effects of process variables (Ar/He plasma gas ratio, the total plasma gas flow, and the torch current) on chamber pressure and torch power. Coating thickness, phase and microstructure were evaluated for each set of deposition conditions. Low chamber pressures and high power were shown to increase coating thickness and create columnar-like structures. Likewise, high chamber pressures and low power had lower growth rates, but resulted in flatter, more homogeneous layers
Electro-spark deposition technology
Energy Technology Data Exchange (ETDEWEB)
Johnson, R.N. [Pacific Northwest National Lab., Richland, WA (United States)
1997-12-01
Electro-Spark Deposition (ESD) is a micro-welding process that uses short duration, high-current electrical pulses to deposit or alloy a consumable electrode material onto a metallic substrate. The ESD process was developed to produce coatings for use in severe environments where most other coatings fail. Because of the exceptional damage resistance of these coatings, and the versatility of the process to apply a wide variety of alloys, intermetallics, and cermets to metal surfaces, the ESD process has been designated critical to the life and economy of the advanced fossil energy systems as the higher temperatures and corrosive environments exceed the limits of known structural materials to accommodate the service conditions. Developments include producing iron aluminide-based coatings with triple the corrosion resistance of the best previous Fe{sub 3}Al coatings, coatings with refractory metal diffusion barriers and multi layer coatings for achieving functionally gradient properties between the substrate and the surface. A new development is the demonstration of advanced aluminide-based ESD coatings for erosion and wear applications. One of the most significant breakthroughs to occur in the last dozen years is the discovery of a process regime that yields an order of magnitude increase in deposition rates and achievable coating thicknesses. Achieving this regime has required the development of advanced ESD electronic capabilities. Development is now focused on further improvements in deposition rates, system reliability when operating at process extremes, and economic competitiveness.
Wada, Takao; Ueda, Noriaki
2013-01-01
The process of low pressure organic vapor phase deposition (LP-OVPD) controls the growth of amorphous organic thin films, where the source gases (Alq3 molecule, etc.) are introduced into a hot wall reactor via an injection barrel using an inert carrier gas (N2 molecule). It is possible to control well the following substrate properties such as dopant concentration, deposition rate, and thickness uniformity of the thin film. In this paper, we present LP-OVPD simulation results using direct simulation Monte Carlo-Neutrals (Particle-PLUS neutral module) which is commercial software adopting direct simulation Monte Carlo method. By estimating properly the evaporation rate with experimental vaporization enthalpies, the calculated deposition rates on the substrate agree well with the experimental results that depend on carrier gas flow rate and source cell temperature. PMID:23674843
Wada, Takao; Ueda, Noriaki
2013-04-01
The process of low pressure organic vapor phase deposition (LP-OVPD) controls the growth of amorphous organic thin films, where the source gases (Alq3 molecule, etc.) are introduced into a hot wall reactor via an injection barrel using an inert carrier gas (N2 molecule). It is possible to control well the following substrate properties such as dopant concentration, deposition rate, and thickness uniformity of the thin film. In this paper, we present LP-OVPD simulation results using direct simulation Monte Carlo-Neutrals (Particle-PLUS neutral module) which is commercial software adopting direct simulation Monte Carlo method. By estimating properly the evaporation rate with experimental vaporization enthalpies, the calculated deposition rates on the substrate agree well with the experimental results that depend on carrier gas flow rate and source cell temperature.
The Reaction of the WIG Stock Market Index to Changes in the Interest Rates on Bank Deposits
Directory of Open Access Journals (Sweden)
Grzegorz Przekota
2010-01-01
Full Text Available Determination of the relationship between the money market and capital market is particularly important from the point of view of taking a decision on the location of investment capital. It may help to forecast future states. This study seeks to determine the relationship of the interest rate on deposits in zloty with the WIG stock index and the volume of turnover on the Warsaw Stock Exchange. Analysis of correlation and VAR models are used. Analysis of long-term correlation indicates a negative relationship between the interest rate on deposits in banks and the value of the WIG stock-index. However, this may be spurious. The dependence between these variables may be more complex and should rather be seen as short term. It seems that in general the impact of an increase in interest rates on the value of the WIG index is negative in the short term, just as in the long term. In addition, in the short term these variables can move in the same direction. The results obtained in the research are consistent with results obtained for other national markets. This applies in particular to the relatively weak, negative correlation described above. (original abstract
Mamun, Md Abdullah Al; Furuta, Hiroshi; Hatta, Akimitsu
2018-06-01
Hydrogenated amorphous carbon (a-C:H) films are deposited on silicon (Si) substrates using a high-repetition microsecond-pulsed DC plasma chemical vapor deposition (CVD) system from acetylene (C2H2) at a gas pressure of 15 Pa inside a custom-made vacuum chamber. The plasma discharge characteristics, hydrocarbon species, and the microstructure of the resulting films are examined at various pulse repetition rates from 50 to 400 kHz and a fixed duty cycle of 50%. The optical emission spectra confirmed the increase in electron excitation energy from 1.09 to 1.82 eV and the decrease in the intensity ratio of CH/C2 from 1.04 to 0.75 with increasing pulse frequency, indicating the enhanced electron impact dissociation of C2H2 gas. With increasing pulse frequency, the deposition rate gradually increased, reaching a maximum rate of 60 nm/min at 200 kHz, after which a progressive decrease was noted, whereas the deposition area was almost uniform for all the prepared films. Clear trends of increasing sp3 content (amorphization) and decreasing hydrogen (H) content in the films were observed as the pulse repetition rate increased, while most of the hydrogen atoms bonded to carbon atoms by sp3 hybridization rather than by sp2 hybridization.
High-pressure turbine deposition in land-based gas turbines from various synfuels
Energy Technology Data Exchange (ETDEWEB)
Bons, J.P.; Crosby, J.; Wammack, J.E.; Bentley, B.I.; Fletcher, T.H. [Brigham Young University, Provo, UT (United States). Dept. of Mechanical Engineering
2007-01-15
Ash deposits from four candidate power turbine synfuels were studied in an accelerated deposition test facility. The facility matches the gas temperature and velocity of modern first-stage high-pressure turbine vanes. A natural gas combustor was seeded with finely ground fuel ash particulate from four different fuels: straw, sawdust, coal, and petroleum coke. The entrained ash particles were accelerated to a combustor exit flow Mach number of 0.31 before impinging on a thermal barrier coating (TBC) target coupon at 1150{sup o}C. Postexposure analyses included surface topography, scanning electron microscopy and x-ray spectroscopy. Due to significant differences in the chemical composition of the various fuel ash samples, deposit thickness and structure vary considerably for fuel. Biomass products (e.g., sawdust and straw) are significantly less prone to deposition than coal and petcoke for the same particle loading conditions. In a test simulating one turbine operating year at a moderate particulate loading of 0.02 parts per million by weight, deposit thickness from coal and petcoke ash exceeded 1 and 2 mm, respectively. These large deposits from coal and petcoke were found to detach readily from the turbine material with thermal cycling and handling. The smaller biomass deposit samples showed greater tenacity, in adhering to the TBC surface. In all cases, corrosive elements (e.g., Na, K, V, Cl, S) were found to penetrate the TBC layer during the accelerated deposition test. Implications for the power generation goal of fuel flexibility are discussed.
High voltage electrophoretic deposition for electrochemical energy storage and other applications
Santhanagopalan, Sunand
High voltage electrophoretic deposition (HVEPD) has been developed as a novel technique to obtain vertically aligned forests of one-dimensional nanomaterials for efficient energy storage. The ability to control and manipulate nanomaterials is critical for their effective usage in a variety of applications. Oriented structures of one-dimensional nanomaterials provide a unique opportunity to take full advantage of their excellent mechanical and electrochemical properties. However, it is still a significant challenge to obtain such oriented structures with great process flexibility, ease of processing under mild conditions and the capability to scale up, especially in context of efficient device fabrication and system packaging. This work presents HVEPD as a simple, versatile and generic technique to obtain vertically aligned forests of different one-dimensional nanomaterials on flexible, transparent and scalable substrates. Improvements on material chemistry and reduction of contact resistance have enabled the fabrication of high power supercapacitor electrodes using the HVEPD method. The investigations have also paved the way for further enhancements of performance by employing hybrid material systems and AC/DC pulsed deposition. Multi-walled carbon nanotubes (MWCNTs) were used as the starting material to demonstrate the HVEPD technique. A comprehensive study of the key parameters was conducted to better understand the working mechanism of the HVEPD process. It has been confirmed that HVEPD was enabled by three key factors: high deposition voltage for alignment, low dispersion concentration to avoid aggregation and simultaneous formation of holding layer by electrodeposition for reinforcement of nanoforests. A set of suitable parameters were found to obtain vertically aligned forests of MWCNTs. Compared with their randomly oriented counterparts, the aligned MWCNT forests showed better electrochemical performance, lower electrical resistance and a capability to
Horn, Lars-Christian; Höhn, Anne K; Einenkel, Jens; Siebolts, Udo
2014-11-01
Molecular studies have shown that the most prevalent mutations in serous ovarian borderline tumors (s-BOT) are BRAF and/or KRAS alterations. About one third of s-BOT represent peritoneal implants and/or lymph node involvement. These extraovarian deposits may be monoclonal or polyclonal in origin. To test both the hypotheses, mutational analyses using pyrosequencing for BRAF codon 600 and KRAS codon 12/13 and 61 of microdissected tissue was performed in 15 s-BOT and their invasive and noninvasive peritoneal implants. Two to 6 implants from different peritoneal sites were examined in 13 cases. Lymph node deposits were available for the analysis in 3 cases. Six s-BOT showed mutation in exon 2 codon 12 of the KRAS proto-oncogen. Five additional cases showed BRAF p.V600E mutation representing an overall mutation rate of 73.3%. Multiple (2-6) peritoneal implants were analyzed after microdissection in 13 of 15 cases. All showed identical mutational results when compared with the ovarian site of the disease. All lymph node deposits, including those with multiple deposits in different nodes, showed identical results, suggesting high intratumoral mutational homogeneity. The evidence presented in this study and the majority of data reported in the literature support the hypothesis that s-BOT with their peritoneal implants and lymph node deposits show identical mutational status of BRAF and KRAS suggesting a monoclonal rather than a polyclonal disease regarding these both tested genetic loci. In addition, a high intratumoral genetic homogeneity can be suggested. In conclusion, the results of the present study support the monoclonal origin of s-BOT and their peritoneal implants and lymph node deposits.
Directory of Open Access Journals (Sweden)
Diego F. Lozano-Cortés
2014-02-01
Full Text Available One of the major stresses on corals is the settlement of suspended sediment on their surfaces. This leads to the blocking of light, the covering of the coral mucus surface and an increased risk of disease. For this reason sediment deposition on a reef is considered a highly important variable in coral reef studies. With the use of sediment traps and oceanographic sensors, the sediment deposition rate and water conditions during a rainy season (April-May 2009 on a Tropical Eastern Pacific coral reef (La Azufrada at Gorgona Island in Colombia were investigated. To quantify sediment deposition, sediment traps were established in nine stations along the coral reef (three stations per reef zone: backreef, flat and slope. To minimize disturbance by aquatic organisms in the sediment traps these were filled with hypersaline borax-buffered 10% formaline solution before their deployment; animals found in the filter contents were fixed and stored in a 4% formalin solution, frozen and identified in the laboratory. To determine the water conditions, discrete samples of water from 1 m and 10 m depths were collected using a Niskin bottle. Oceanographic variables (temperature, salinity and dissolved oxygen as well as turbidity, chlorophyll and nutrient concentration (nitrite, nitrate and phosphorus were measured in the samples from both depths. Vertical records of temperature and salinity were carried out with a Seabird-19 CTD nearest to La Azufrada and water transparency was measured using a Secchi disk. We found a mean trap collection rate of 23.30±4.34gm-2d-1 and did not detect a significant difference in the trap collection rate among reef zones. The mean temperature and salinity in the coral reef depth zone (0-10m layer were 26.98±0.19°C and 32.60±0.52, respectively. Fourteen taxonomic groups of invertebrates were detected inside the sediment traps with bivalves and copepods being the most abundant and frequen. The findings presented here constitute
Lozano-Cortés, Diego F
2014-02-01
One of the major stresses on corals is the settlement of suspended sediment on their surfaces. This leads to the blocking of light, the covering of the coral mucus surface and an increased risk of disease. For this reason sediment deposition on a reef is considered a highly important variable in coral reef studies. With the use of sediment traps and oceanographic sensors, the sediment deposition rate and water conditions during a rainy season (April-May 2009) on a Tropical Eastern Pacific coral reef (La Azufrada) at Gorgona Island in Colombia were investigated. To quantify sediment deposition, sediment traps were established in nine stations along the coral reef (three stations per reef zone: backreef, flat and slope). To minimize disturbance by aquatic organisms in the sediment traps these were filled with hypersaline borax-buffered 10% formaline solution before their deployment; animals found in the filter contents were fixed and stored in a 4% formalin solution, frozen and identified in the laboratory. To determine the water conditions, discrete samples of water from 1 m and 10 m depths were collected using a Niskin bottle. Oceanographic variables (temperature, salinity and dissolved oxygen) as well as turbidity, chlorophyll and nutrient concentration (nitrite, nitrate and phosphorus) were measured in the samples from both depths. Vertical records of temperature and salinity were carried out with a Seabird-19 CTD nearest to La Azufrada and water transparency was measured using a Secchi disk. We found a mean trap collection rate of 23.30±4.34gm-2d-1 and did not detect a significant difference in the trap collection rate among reef zones. The mean temperature and salinity in the coral reef depth zone (0-10m layer) were 26.98±0.19°C and 32.60±0.52, respectively. Fourteen taxonomic groups of invertebrates were detected inside the sediment traps with bivalves and copepods being the most abundant and frequen. The findings presented here constitute the first report
Vacuum-integrated electrospray deposition for highly reliable polymer thin film.
Park, Soohyung; Lee, Younjoo; Yi, Yeonjin
2012-10-01
Vacuum electrospray deposition (ESD) equipment was designed to prepare polymer thin films. The polymer solution can be injected directly into vacuum system through multi-stage pumping line, so that the solvent residues and ambient contaminants are highly reduced. To test the performance of ESD system, we fabricated organic photovoltaic cells (OPVCs) by injecting polymer solution directly onto the substrate inside a high vacuum chamber. The OPVC fabricated has the structure of Al∕P3HT:PCBM∕PEDOT:PSS∕ITO and was optimized by varying the speed of solution injection and concentration of the solution. The power conversion efficiency (PCE) of the optimized OPVC is 3.14% under AM 1.5G irradiation without any buffer layer at the cathode side. To test the advantages of the vacuum ESD, we exposed the device to atmosphere between the deposition steps of the active layer and cathode. This showed that the PCE of the vacuum processed device is 24% higher than that of the air exposed device and confirms the advantages of the vacuum prepared polymer film for high performance devices.
International Nuclear Information System (INIS)
Zhang Da; Stout, Phillip J.; Ventzek, Peter L.G.
2003-01-01
High power magnetron physical vapor deposition (HPM-PVD) has recently emerged for metal deposition into deep submicron features in state of the art integrated circuit fabrication. However, the plasma characteristics and process mechanism are not well known. An integrated plasma equipment-feature profile modeling infrastructure has therefore been developed for HPM-PVD deposition, and it has been applied to simulating copper seed deposition with an Ar background gas for damascene metalization. The equipment scale model is based on the hybrid plasma equipment model [M. Grapperhaus et al., J. Appl. Phys. 83, 35 (1998); J. Lu and M. J. Kushner, ibid., 89, 878 (2001)], which couples a three-dimensional Monte Carlo sputtering module within a two-dimensional fluid model. The plasma kinetics of thermalized, athermal, and ionized metals and the contributions of these species in feature deposition are resolved. A Monte Carlo technique is used to derive the angular distribution of athermal metals. Simulations show that in typical HPM-PVD processing, Ar + is the dominant ionized species driving sputtering. Athermal metal neutrals are the dominant deposition precursors due to the operation at high target power and low pressure. The angular distribution of athermals is off axis and more focused than thermal neutrals. The athermal characteristics favor sufficient and uniform deposition on the sidewall of the feature, which is the critical area in small feature filling. In addition, athermals lead to a thick bottom coverage. An appreciable fraction (∼10%) of the metals incident to the wafer are ionized. The ionized metals also contribute to bottom deposition in the absence of sputtering. We have studied the impact of process and equipment parameters on HPM-PVD. Simulations show that target power impacts both plasma ionization and target sputtering. The Ar + ion density increases nearly linearly with target power, different from the behavior of typical ionized PVD processing. The
EFFECT OF La2O3 ON HIGH-TEMPERATURE OXIDATION RESISTANCE OF ELECTROSPARK DEPOSITED Ni-BASED COATINGS
YUXIN GAO; JIAN YI; ZHIGANG FANG; HU CHENG
2014-01-01
The oxidation tests of electrospark deposited Ni-based coatings without and with 2.5 wt.% La2O3 were conducted at 960°C in air for 100 h. The oxidation kinetic of the coatings was studied by testing the weight gain. The phase structures and morphologies of the oxidized coatings were investigated by XRD and SEM. The experimental results show that the coatings with 2.5 wt.% La2O3 exhibits excellent high-temperature oxidation resistance including low oxidation rate and improved spallation resist...
Chemically vapor-deposited tungsten: its high temperature strength and ductility
International Nuclear Information System (INIS)
Bryant, W.A.
1977-01-01
The high temperature tensile ductility (as measured by total elongation normal to the growth direction) of chemically vapor-deposited tungsten was found to be significantly greater than previously reported. A correlation was found between ductility and void content. However, voids were found to have essentially no effect on the high temperature strength of this material, which is considerably weaker than powder metallurgy tungsten. (Auth.)
High Acetic Acid Production Rate Obtained by Microbial Electrosynthesis from Carbon Dioxide.
Jourdin, Ludovic; Grieger, Timothy; Monetti, Juliette; Flexer, Victoria; Freguia, Stefano; Lu, Yang; Chen, Jun; Romano, Mark; Wallace, Gordon G; Keller, Jurg
2015-11-17
High product specificity and production rate are regarded as key success parameters for large-scale applicability of a (bio)chemical reaction technology. Here, we report a significant performance enhancement in acetate formation from CO2, reaching comparable productivity levels as in industrial fermentation processes (volumetric production rate and product yield). A biocathode current density of -102 ± 1 A m(-2) and an acetic acid production rate of 685 ± 30 (g m(-2) day(-1)) have been achieved in this study. High recoveries of 94 ± 2% of the CO2 supplied as the sole carbon source and 100 ± 4% of electrons into the final product (acetic acid) were achieved after development of a mature biofilm, reaching an elevated product titer of up to 11 g L(-1). This high product specificity is remarkable for mixed microbial cultures, which would make the product downstream processing easier and the technology more attractive. This performance enhancement was enabled through the combination of a well-acclimatized and enriched microbial culture (very fast start-up after culture transfer), coupled with the use of a newly synthesized electrode material, EPD-3D. The throwing power of the electrophoretic deposition technique, a method suitable for large-scale production, was harnessed to form multiwalled carbon nanotube coatings onto reticulated vitreous carbon to generate a hierarchical porous structure.
International Nuclear Information System (INIS)
Ndiege, Nicholas; Subramanian, Vaidyanathan; Shannon, Mark A.; Masel, Richard I.
2008-01-01
Microwave-assisted chemical vapor deposition has been used to generate high quality, high-k dielectric films on silicon at high deposition rates with film thicknesses varying from 50 nm to 110 μm using inexpensive equipment. Characterization of the post deposition products was performed by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, Auger electron spectroscopy and Raman spectroscopy. Film growth was determined to occur via rapid formation and accumulation of tantalum oxide clusters from tantalum (v) ethoxide (Ta(OC 2 H 5 ) 5 ) vapor on the deposition surface
76 FR 42015 - Prohibition Against Payment of Interest on Demand Deposits
2011-07-18
...-free demand deposit base is the primary franchise builder for community banks and the largest source of... would harm the market for municipal bonds, because community banks would be no longer able to buy fixed... banks would be likely to try to ``buy'' demand deposits by offering unsustainably high interest rates...
Advanced deposition model for thermal activated chemical vapor deposition
Cai, Dang
Thermal Activated Chemical Vapor Deposition (TACVD) is defined as the formation of a stable solid product on a heated substrate surface from chemical reactions and/or dissociation of gaseous reactants in an activated environment. It has become an essential process for producing solid film, bulk material, coating, fibers, powders and monolithic components. Global market of CVD products has reached multi billions dollars for each year. In the recent years CVD process has been extensively used to manufacture semiconductors and other electronic components such as polysilicon, AlN and GaN. Extensive research effort has been directed to improve deposition quality and throughput. To obtain fast and high quality deposition, operational conditions such as temperature, pressure, fluid velocity and species concentration and geometry conditions such as source-substrate distance need to be well controlled in a CVD system. This thesis will focus on design of CVD processes through understanding the transport and reaction phenomena in the growth reactor. Since the in situ monitor is almost impossible for CVD reactor, many industrial resources have been expended to determine the optimum design by semi-empirical methods and trial-and-error procedures. This approach has allowed the achievement of improvements in the deposition sequence, but begins to show its limitations, as this method cannot always fulfill the more and more stringent specifications of the industry. To resolve this problem, numerical simulation is widely used in studying the growth techniques. The difficulty of numerical simulation of TACVD crystal growth process lies in the simulation of gas phase and surface reactions, especially the latter one, due to the fact that very limited kinetic information is available in the open literature. In this thesis, an advanced deposition model was developed to study the multi-component fluid flow, homogeneous gas phase reactions inside the reactor chamber, heterogeneous surface
Long-term trends of sulfur deposition in East Asia during 1981-2005
Kuribayashi, Masatoshi; Ohara, Toshimasa; Morino, Yu; Uno, Itsushi; Kurokawa, Jun-ichi; Hara, Hiroshi
2012-11-01
We used a chemical transport model to investigate the long-term trends of sulfur deposition in East Asia during 1981-2005. The model reproduced the observed spatial distributions in East Asia of the rate of wet deposition of non-seasalt sulfate (nss-SO42-), volume-weighted mean concentrations of nss-SO42- in precipitation, precipitation, and concentrations in air of gaseous sulfur dioxide and particulate nss-SO42-. The model also reproduced well observed seasonal variations and long-term trends of wet deposition of nss-SO42- in Japan from 1988 to 2005. The increasing rate of wet deposition of nss-SO42- in Japan during 1991-2005 was demonstrated with 99.9% significance for both observed and modeled data. The annual rate of total (wet + dry) sulfur deposition in Japan increased from 15.6 Gmol S y-1 in 1981-1985 to 23.9 Gmol S y-1 in 2001-2005 in response to both increasing contributions from Chinese emissions and the eruption of Miyakejima volcano in 2000. During that 25-year period, approximately 2.1% of the sulfur from Chinese emissions was deposited in Japan. Over the same period, the rate of deposition of sulfur in East Asia increased gradually from 14.2 mmol S m-2 y-1 to 24.0 mmol S m-2 y-1, and the contribution of emissions from China to total sulfur deposition in East Asia increased from 65% to 77%. The contribution of Miyakejima volcano was 3% during 2001-2005. The increase in the sulfur deposition rate was remarkably high on the North China Plain, around Guangzhou, and south of Chongqing. The rate of increase in East Asia was greatest in winter, although the rate of sulfur deposition was highest in summer. Sulfur flux from China to Japan increased by a factor of 2.5 at altitudes of 0-3000 m from 1981 to 2005.
Transparent, high mobility InGaZnO thin films deposited by PLD
International Nuclear Information System (INIS)
Suresh, Arun; Gollakota, Praveen; Wellenius, Patrick; Dhawan, Anuj; Muth, John F.
2008-01-01
Transparent oxide semiconductor, InGaZnO, thin films were prepared by pulsed laser deposition at room temperature. The carrier concentration was found to vary by several orders of magnitude from insulating to 10 19 carriers/cm 3 depending on the oxygen partial pressure during deposition. Hall mobilities as high as 16 cm 2 /V s were observed. This is approximately an order of magnitude higher than the mobility of amorphous silicon and indicates that InGaO 3 (ZnO) x with x ≤ 5 may be suitable for transparent, thin film transistor applications. Post-deposition annealing was found to strongly influence the carrier concentration while annealing effects on the electron mobility was less influential
Particle deposition in ventilation ducts
Energy Technology Data Exchange (ETDEWEB)
Sippola, Mark Raymond [Univ. of California, Berkeley, CA (United States)
2002-09-01
Exposure to airborne particles is detrimental to human health and indoor exposures dominate total exposures for most people. The accidental or intentional release of aerosolized chemical and biological agents within or near a building can lead to exposures of building occupants to hazardous agents and costly building remediation. Particle deposition in heating, ventilation and air-conditioning (HVAC) systems may significantly influence exposures to particles indoors, diminish HVAC performance and lead to secondary pollutant release within buildings. This dissertation advances the understanding of particle behavior in HVAC systems and the fates of indoor particles by means of experiments and modeling. Laboratory experiments were conducted to quantify particle deposition rates in horizontal ventilation ducts using real HVAC materials. Particle deposition experiments were conducted in steel and internally insulated ducts at air speeds typically found in ventilation ducts, 2-9 m/s. Behaviors of monodisperse particles with diameters in the size range 1-16 μm were investigated. Deposition rates were measured in straight ducts with a fully developed turbulent flow profile, straight ducts with a developing turbulent flow profile, in duct bends and at S-connector pieces located at duct junctions. In straight ducts with fully developed turbulence, experiments showed deposition rates to be highest at duct floors, intermediate at duct walls, and lowest at duct ceilings. Deposition rates to a given surface increased with an increase in particle size or air speed. Deposition was much higher in internally insulated ducts than in uninsulated steel ducts. In most cases, deposition in straight ducts with developing turbulence, in duct bends and at S-connectors at duct junctions was higher than in straight ducts with fully developed turbulence. Measured deposition rates were generally higher than predicted by published models. A model incorporating empirical equations based on the
Energy Technology Data Exchange (ETDEWEB)
Maindron, Tony, E-mail: tony.maindron@cea.fr; Jullien, Tony; André, Agathe [Université Grenoble-Alpes, CEA, LETI, MINATEC Campus, 17 rue des Martyrs, F-38054 Grenoble Cedex 9 (France)
2016-05-15
low defect growth rate of 0.032/cm{sup 2}/h (t > τ) have been measured. At the end of the storage test (2003 h), the defect density remains very low, i.e., only 50/cm{sup 2}. On the other hand, the device with the single PVD-deposited SiO barrier layer shows no significant lag time (τ ∼ 0), and the number of defects grows linearly from initial time with a high occurrence rate of 0.517/cm{sup 2}/h. This is coherent with the pinhole-full nature of fresh, PVD-deposited, SiO films. At intermediate times, a second regime shows a lower defect occurrence rate of 0.062/cm{sup 2}/h. At a longer time span (t > 1200 h), the SiO barrier begins to degrade, and a localized crystallization onto the oxide surface, giving rise to new defects (occurrence rate 0.461/cm{sup 2}/h), could be observed. At the end of the test (2003 h), single SiO films show a very high defect density of 600/cm{sup 2}. Interestingly, the SiO surface in the Al{sub 2}O{sub 3}/SiO device does not appeared crystallized at a high time span, suggesting that the crystallization observed on the SiO surface in the AlQ{sub 3}/SiO device rather originates into the AlQ{sub 3} layer, due to high humidity ingress on the organic layer through SiO pinholes. This has been confirmed by atomic force microscopy surface imaging of the AlQ{sub 3}/SiO surface showing a central hole in the crystallization zone with a 60 nm depth, deeper than SiO thickness (25 nm). Using the organic AlQ{sub 3} sensor, the different observations made in this work give a quantitative comparison of defects' occurrence and growth in ALD-deposited versus PVD-deposited oxide films, as well as in their combination PVD/ALD and ALD/PVD.
Modeling high-density-plasma deposition of SiO{sub 2} in SiH{sub 4}/O{sub 2}/Ar
Energy Technology Data Exchange (ETDEWEB)
Meeks, E.; Larson, R.S. [Sandia National Labs., Livermore, CA (United States); Ho, P.; Apblett, C. [Sandia National Labs., Albuquerque, NM (United States); Han, S.M.; Edelberg, E.; Aydil, E. [Univ. of California, Santa Barbara, CA (United States)
1997-03-01
The authors have compiled sets of gas-phase and surface reactions for use in modeling plasma-enhanced chemical vapor deposition of silicon dioxide from silane, oxygen and argon gas mixtures in high-density-plasma reactors. They have applied the reaction mechanisms to modeling three different kinds of high-density plasma deposition chambers, and tested them by comparing model predictions to a variety of experimental measurements. The model simulates a well mixed reactor by solving global conservation equations averaged across the reactor volume. The gas-phase reaction mechanism builds from fundamental electron-impact cross section data available in the literature, and also includes neutral-molecule, ion-ion, and ion-molecule reaction paths. The surface reaction mechanism is based on insight from attenuated total-reflection Fourier-transform infrared spectroscopy experiments. This mechanism describes the adsorption of radical species on an oxide surface, ion-enhanced reactions leading to species desorption from the surface layer, radical abstractions competing for surface sites, and direct energy-dependent ion sputtering of the oxide material. Experimental measurements of total ion densities, relative radical densities as functions of plasma operating conditions, and net deposition-rate have been compared to model predictions to test and modify the chemical kinetics mechanisms. Results show good quantitative agreement between model predictions and experimental measurements.
International Nuclear Information System (INIS)
Satterley, Christopher J; Perdigao, LuIs M A; Saywell, Alex; Magnano, Graziano; Rienzo, Anna; Mayor, Louise C; Dhanak, Vinod R; Beton, Peter H; O'Shea, James N
2007-01-01
Electrospray deposition of fullerenes on gold has been successfully observed by in situ room temperature scanning tunneling microscopy and photoemission spectroscopy. Step-edge decoration and hexagonal close-packed islands with a periodicity of 1 nm are observed at low and multilayer coverages respectively, in agreement with thermal evaporation studies. Photoemission spectroscopy shows that fullerenes are being deposited in high purity and are coupling to the gold surface as for thermal evaporation. These results open a new route for the deposition of thermally labile molecules under ultra-high vacuum conditions for a range of high resolution surface science techniques
Evaluating the rate of migration of an uranium deposition front within the Uitenhage Aquifer
CSIR Research Space (South Africa)
Vogel
1999-07-01
Full Text Available of Geochemical Exploration 66 (1999) 269?276 www.elsevier.com/locate/jgeoexp Evaluating the rate of migration of an uranium deposition front within the Uitenhage Aquifer J.C. Vogel a,A.S.Talmaa, T.H.E. Heaton b, J. Kronfeld c,* a Quaternary Dating Research Unit... stream_source_info vogel_1999.pdf.txt stream_content_type text/plain stream_size 18078 Content-Encoding ISO-8859-1 stream_name vogel_1999.pdf.txt Content-Type text/plain; charset=ISO-8859-1 ELSEVIER Journal...
Sun, Kainan; Steck, Daniel J; Field, R William
2009-08-01
The quantitative relationships between radon gas concentration, the surface-deposited activities of various radon progeny, the airborne radon progeny dose rate, and various residential environmental factors were investigated through actual field measurements in 38 selected Iowa houses occupied by either smokers or nonsmokers. Airborne dose rate was calculated from unattached and attached potential alpha energy concentrations (PAECs) using two dosimetric models with different activity-size weighting factors. These models are labeled Pdose and Jdose, respectively. Surface-deposited 218Po and 214Po were found significantly correlated to radon, unattached PAEC, and both airborne dose rates (p fireplace, or usage of a ceiling fan significantly, or marginally significantly, reduced the Pdose to 0.65 (90% CI 0.42-0.996), 0.54 (90% CI 0.28-1.02), and 0.66 (90% CI 0.45-0.96), respectively. For Jdose, only the usage of a ceiling fan significantly reduced the dose rate to 0.57 (90% CI 0.39-0.85). In smoking environments, deposited 218Po was a significant negative predictor for Pdose (RR 0.68, 90% CI 0.55-0.84) after adjusting for long-term 222Rn and environmental factors. A significant decrease of 0.72 (90% CI 0.64-0.83) in the mean Pdose was noted, after adjusting for the radon and radon progeny effects and other environmental factors, for every 10 additional cigarettes smoked in the room. A significant increase of 1.71 in the mean Pdose was found for large room size relative to small room size (90% CI 1.08-2.79) after adjusting for the radon and radon progeny effects as well as other environmental factors. Fireplace usage was found to significantly increase the mean Pdose to 1.71 (90% CI 1.20-2.45) after adjusting for other factors.
Gastric cancer in New Mexico counties with significant deposits of uranium
International Nuclear Information System (INIS)
Wilkinson, G.S.
1985-01-01
Several counties in northern New Mexico display high rates of mortality from gastric cancer. Significant differences in sex-specific, age-adjusted, average annual stomach cancer mortality rates among whites from 1970-1979 were found between counties with significant deposits of uranium compared to those without significant deposits. These results remained unchanged when either socioeconomic status or Hispanic ethnicity were considered. Additional research needs to consider individual characteristics and competing risk factors for individuals with gastric cancer in these counties. A working hypothesis is that residents of counties with significant deposits of uranium are exposed to higher-than-average environmental levels of radionuclides such as radon and radon daughters, or to trace elements such as arsenic, cadmium, selenium, and lead which are commonly found in areas with uranium deposits
Ferrero, Luca; Casati, Marco; Nobili, Lara; D'Angelo, Luca; Rovelli, Grazia; Sangiorgi, Giorgia; Rizzi, Cristiana; Perrone, Maria Grazia; Sansonetti, Antonio; Conti, Claudia; Bolzacchini, Ezio; Bernardi, Elena; Vassura, Ivano
2018-04-01
The collection of atmospheric particles on not-filtering substrates via dry deposition, and the subsequent study of the particle-induced material decay, is trivial due to the high number of variables simultaneously acting on the investigated surface. This work reports seasonally resolved data of chemical composition and size distribution of particulate matter deposed on stone and surrogate surfaces obtained using a new method, especially developed at this purpose. A "Deposition Box" was designed allowing the particulate matter dry deposition to occur selectively removing, at the same time, variables that can mask the effect of airborne particles on material decay. A pitched roof avoided rainfall and wind variability; a standardised gentle air exchange rate ensured a continuous "sampling" of ambient air leaving unchanged the sampled particle size distribution and, at the same time, leaving quite calm condition inside the box, allowing the deposition to occur. Thus, the "Deposition Box" represents an affordable tool that can be used complementary to traditional exposure systems. With this system, several exposure campaigns, involving investigated stone materials (ISMs) (Carrara Marble, Botticino limestone, Noto calcarenite and Granite) and surrogate (Quartz, PTFE, and Aluminium) substrates, have been performed in two different sites placed in Milan (Italy) inside and outside the low emission zone. Deposition rates (30-90 μg cm -2 month -1 ) showed significant differences between sites and seasons, becoming less evident considering long-period exposures due to a positive feedback on the deposition induced by the deposited particles. Similarly, different stone substrates influenced the deposition rates too. The collected deposits have been observed with optical and scanning electron microscopes and analysed by ion chromatography. Ion deposition rates were similar in the two sites during winter, whereas it was greater outside the low emission zone during summer and
Luo, Jingshan; Liu, Jilei; Zeng, Zhiyuan; Ng, Chi Fan; Ma, Lingjie; Zhang, Hua; Lin, Jianyi; Shen, Zexiang; Fan, Hong Jin
2013-01-01
Fe3O4 has long been regarded as a promising anode material for lithium ion battery due to its high theoretical capacity, earth abundance, low cost, and nontoxic properties. However, up to now no effective and scalable method has been realized to overcome the bottleneck of poor cyclability and low rate capability. In this article, we report a bottom-up strategy assisted by atomic layer deposition to graft bicontinuous mesoporous nanostructure Fe3O4 onto three-dimensional graphene foams and directly use the composite as the lithium ion battery anode. This electrode exhibits high reversible capacity and fast charging and discharging capability. A high capacity of 785 mAh/g is achieved at 1C rate and is maintained without decay up to 500 cycles. Moreover, the rate of up to 60C is also demonstrated, rendering a fast discharge potential. To our knowledge, this is the best reported rate performance for Fe3O4 in lithium ion battery to date.
Seasonal Patterns of Dry Deposition at a High-Elevation Site in the Colorado Rocky Mountains
Oldani, Kaley M.; Mladenov, Natalie; Williams, Mark W.; Campbell, Cari M.; Lipson, David A.
2017-10-01
In the Colorado Rocky Mountains, high-elevation barren soils are deficient in carbon (C) and phosphorus (P) and enriched in nitrogen (N). The seasonal variability of dry deposition and its contributions to alpine elemental budgets is critical to understanding how dry deposition influences biogeochemical cycling in high-elevation environments. In this 2 year study, we evaluated dry and wet deposition inputs to the Niwot Ridge Long Term Ecological Research (NWT LTER) site in the Colorado Rocky Mountains. The total organic C flux in wet + dry (including soluble and particulate C) deposition was >30 kg C ha-1 yr-1 and represents a substantial input for this C-limited environment. Our side-by-side comparison of dry deposition collectors with and without marble insert indicated that the insert improved retention of dry deposition by 28%. Annual average dry deposition fluxes of water-soluble organic carbon (4.25 kg C ha-1 yr-1) and other water-soluble constituents, including ammonium (0.16 kg NH4+ha-1 yr-1), nitrate (1.99 kg NO3- ha-1 yr-1), phosphate (0.08 kg PO43- ha-1 yr-1), and sulfate (1.20 kg SO42- ha-1 yr-1), were comparable to those in wet deposition, with highest values measured in the summer. Backward trajectory analyses implicate air masses passing through the arid west and Four Corners, USA, as dominant source areas for dry deposition, especially in spring months. Synchronous temporal patterns of deposition observed at the NWT LTER site and a distant Rocky Mountain National Park Clean Air Status and Trends Network site indicate that seasonal dry deposition patterns are regional phenomena with important implications for the larger Rocky Mountain region.
Deuterium trapping in tungsten deposition layers formed by deuterium plasma sputtering
International Nuclear Information System (INIS)
Alimov, V.Kh.; Roth, J.; Shu, W.M.; Komarov, D.A.; Isobe, K.; Yamanishi, T.
2010-01-01
A study of the influence of the deposition conditions on the surface morphology and deuterium (D) concentration in tungsten (W) deposition layers formed by magnetron sputtering and in the linear plasma generator has been carried out. Thick W layers (≥0.4 μm) deposited onto copper substrates demonstrate areas of pilling and, after post-deposition heating to 1300 K, flaking-off and fracturing. For thin W layers (≤80 nm) deposited onto stainless steel (SS) and W substrates, no areas of flaking-off and fracturing exist both after deposition and after post-deposition heating to 673 K for the SS substrate and to 1300 K for the W substrate. The concentration of deuterium in the W layers was found to decrease with increasing substrate temperature and with increasing tungsten deposition rate. For layers with relatively high concentration of oxygen (0.20-0.60 O/W), a decrease of the D concentration with increasing substrate temperature is more pronounced than that for layers deposited in good vacuum conditions. To describe the evolution of the D/W ratio with the substrate temperature and the tungsten deposition rate, an empirical equation proposed by De Temmerman and Doerner [J. Nucl. Mater. 389 (2009) 479] but with alternative parameters has been used.
Research of boron conversion coating in neutron detector with boron deposited GEM
International Nuclear Information System (INIS)
Ye Di; Sun Zhijia; Zhou Jianrong; Wang Yanfeng; Yang Guian; Xu Hong; Chen Yuanbai; Xiao Yu; Diao Xungang
2014-01-01
GEM is a flourishing new gas detector and nowadays its technology become more mature. It has outstanding properties, such as excellent position resolution, high counting rate, radiation resistance, simple and flexible signal readout, can be large-area detector, wide application range. Detector with boron deposited GEM uses multilayer GEM with deposited boron film as neutron conversion carrier which reads out the information of neutron shot from the readout electrode with gas amplification from every GEM layer. The detector is high performance which can meet the demands of neutron detector of a new generation. Boron deposited neutron conversion electrode with boron deposited cathode and GEM included is the core part of the detector. As boron is a high-melting-point metalloid (> 2 000 ℃), electroplating and thermal evaporation are inappropriate ways. So finding a way to deposit boron on electrode which can meet the demands become a key technology in the development of neutron detector with boron deposited GEM. Compared with evaporation, sputtering has features such as low deposition temperature, high film purity, nice adhesive, thus is appropriate for our research. Magnetron sputtering is a improved way of sputtering which can get lower sputtering air pressure and higher target voltage, so that we can get better films. Through deposit process, the research uses magnetron sputtering to deposit pure boron film on copper electrode and GEM film. This method can get high quality, nice adhere, high purity, controllable uniformity, low cost film with high speed film formation. (authors)
Formation, Sintering and Removal of Biomass Ash Deposits
DEFF Research Database (Denmark)
Laxminarayan, Yashasvi
conditions in laboratory-scale setups. Deposit formation was simulated in an Entrained Flow Reactor, to investigate the effect of operating conditions and ash chemistry on the rate of deposit formation. Experiments were performed using model biomass fly ash, prepared from mixtures of K2Si4O9, KCl, K2SO4, Ca....... Moreover, biomass ash deposits may cause severe corrosion of boiler surfaces. Therefore, reducing deposit formation and timely deposit removal are essential for optimal boiler operation. The formation, sintering and removal of boiler deposits has been investigated in this PhD project, by simulating boiler...... temperature increased the sticking probability of the fly ash particles/deposit surface, thereby increasing the rate of deposit formation. However, increasing flue gas velocity resulted in a decrease in the deposit formation rate, due to increased particle rebound. Furthermore, it was observed...
Response of Sphagnum mosses to increased CO2 concentration and nitrogen deposition
International Nuclear Information System (INIS)
Jauhiainen, J.
1998-01-01
The main objective of this work was to study the effects of different CO 2 concentration and N deposition rates on Sphagna adapted to grow along a nutrient availability gradient (i.e. ombrotrophy-mesotrophy-eutrophy). The study investigated: (i) the effects of various longterm CO 2 concentrations on the rate of net photosynthesis in Sphagna, (ii) the effects of the CO 2 and N treatments on the moss density, shoot dry masses, length increment and dry mass production in Sphagna, (iii) the concentrations of the major nutrients in Sphagna after prolonged exposure to the CO 2 and N treatments, and (iv) species dependent differences in potential NH 4 + and NO 3 - uptake rates. The internal nutrient concentration of the capitulum and the production of biomass were effected less by the elevated CO 2 concentrations because the availability of N was a controlling factor. In addition responses to the N treatments were related to ecological differences between the Sphagna species. Species with a high tolerance of N availability were able to acclimatise to the increased N deposition rates. The data suggests a high nutrient status is less significant than the adaptation of the Sphagna to their ecological niche (e.g. low tolerance of meso-eutrophic S. warnstorfii to high N deposition rate). At the highest N deposition rate the ombrotrophic S. fuscum had the highest increase in tissue N concentration among the Sphagna studied. S. fuscum almost died at the highest N deposition rate because of the damaging effects of N to the plant's metabolism. Ombrotrophic hummock species such as S. fuscum, were also found to have the highest potential N uptake rate (on density of dry mass basis) compared to lawn species. The rate of net photosynthesis was initially increased with elevated CO 2 concentrations, but photosynthesis was down regulated with prolonged exposure to CO 2 . The water use efficiency in Sphagna appeared not to be coupled with exposure to the long-term CO 2 concentration. The
Kaufman, Darrell S.; Brigham-Grette, Julie
Multiple periods of Late Pliocene and Pleistocene high sea level are recorded by surficial deposits along the coastal plains of northwestern Alaska. Analyses of the extent of amino acid epimerization in fossil molluscan shells from the Nome coastal plain of the northern Bering Sea coast, and from the Alaskan Arctic Coastal Plain of the Chukchi and Beaufort Sea coasts, allow recognition of at least five intervals of higher-than-present relative sea level. Three Late Pliocene transgressions are represented at Nome by the complex and protracted Beringian transgression, and on the Arctic Coastal Plain by the Colvillian, Bigbendian, and Fishcreekian transgressions. These were followed by a lengthy period of non-marine deposition during the Early Pleistocene when sea level did not reach above its present position. A Middle Pleistocene high-sea-level event is represented at Nome by the Anvilian transgression, and on the Arctic Coastal Plain by the Wainwrightian transgression. Anvilian deposits at the type locality are considerably younger than previously thought, perhaps as young as Oxygen-Isotope Stage 11 (˜410,000 BP). Finally, the last interglacial Pelukian transgression is represented discontinuously along the shores of northwestern Alaska. Amino acid epimerization data, together with previous paleomagnetic measurements, radiometric-age determinations, and paleontologic evidence provide geochronological constraints on the sequence of marine deposits. They form the basis of regional correlations and offer a means of evaluating the post-depositional thermal history of the high-sea-level deposits. Provisional correlations between marine units at Nome and the Artic Coastal Plain indicate that the temperature difference that separates the two sites today had existed by about 3.0 Ma. Since that time, the effective diagenetic temperature was lowered by about 3-4°C at both sites, and the mean annual temperature was lowered considerably more. This temperature decrease was
CO2 deficit in temperate forest soils receiving high atmospheric N-deposition.
Fleischer, Siegfried
2003-02-01
Evidence is provided for an internal CO2 sink in forest soils, that may have a potential impact on the global CO2-budget. Lowered CO2 fraction in the soil atmosphere, and thus lowered CO2 release to the aboveground atmosphere, is indicated in high N-deposition areas. Also at forest edges, especially of spruce forest, where additional N-deposition has occurred, the soil CO2 is lowered, and the gradient increases into the closed forest. Over the last three decades the capacity of the forest soil to maintain the internal sink process has been limited to a cumulative supply of approximately 1000 and 1500 kg N ha(-1). Beyond this limit the internal soil CO2 sink becomes an additional CO2 source, together with nitrogen leaching. This stage of "nitrogen saturation" is still uncommon in closed forests in southern Scandinavia, however, it occurs in exposed forest edges which receive high atmospheric N-deposition. The soil CO2 gradient, which originally increases from the edge towards the closed forest, becomes reversed.
Sensitivity of the xerophytic moss Syntrichia caninervis to chronic simulated nitrogen deposition
Zhang, Yuanming
2016-04-01
Biological soil crusts, complex of cyanobacteira, fungi, lichens and mosses, are common in dryland area and act as important elements of these ecosystems. Syntrichia caninervis is the dominant species in moss crusts in many desert ecosystems. Increasing N deposition has lead to great changes in community structure and function in the desert ecosystem worldwide. However, it is unclear how moss crusts respond to increased atmospheric N deposition, especially in term of growth and physiological parameters. The population and individual growth, and physiological responses of S. caninervis to six different doses of simulated N deposition (0, 0.3, 0.5, 1.0, 1.5 and 3.0 g N m-2 a-1) over three years were studied. Simulated N deposition in the Gurbantunggut Desert affected growth and physiological indices of the xerophytic moss S.caninervis. Low N addition increased individual plant length and leaf size. High N addition was detrimental to almost all growth characteristics monitored, although moss abundance was increased. The photosynthesis-related indices were moderately increased at low N addition rates and significantly decreased by high N addition. Changes in osmotic adjustment substance concentrations and activities of antioxidant enzymes facilitated protection of leaf cells from oxidative damage under N addition. Low rates of N additiondid not significantly affect, and may even stimulate growth and physiological activity of moss crusts. However, high rates of N addition decreased moss vitality and might affect the function of moss crusts. Moss crusts are sensitive to N addition and greater attention should be paid to protection of such kinds of biological complexes in desert ecosystems under increasing N deposition. Key words: antioxidant enzyme, chlorophyll, fluorescence, nitrogen deposition, osmotic substance, Syntrichia caninervis
Understanding High Rate Behavior Through Low Rate Analog
2014-04-28
challenges in high rate character- isation of polymers. The most important is that, owing to their low stress wavespeed, the structural response of...box’ tool, to provide supporting date for the rate dependent mechanical character- isation . Experiments were performed on a TA instruments Q800
Snowden, Darci; Smith, Michael; Jimson, Theodore; Higgins, Alex
2018-05-01
Cassini's Radio Science Investigation (RSS) and Langmuir Probe observed abnormally high electron densities in Titan's ionosphere during Cassini's T57 flyby. We have developed a three-dimensional model to investigate how the precipitation of thermal magnetospheric O+ may have contributed to enhanced ion production in Titan's ionosphere. The three-dimensional model builds on previous work because it calculates both the flux of oxygen through Titan's exobase and the energy deposition and ion production rates in Titan's atmosphere. We find that energy deposition rates and ion production rates due to thermal O+ precipitation have a similar magnitude to the rates from magnetospheric electron precipitation and that the simulated ionization rates are sufficient to explain the abnormally high electron densities observed by RSS and Cassini's Langmuir Probe. Globally, thermal O+ deposits less energy in Titan's atmosphere than solar EUV, suggesting it has a smaller impact on the thermal structure of Titan's neutral atmosphere. However, our results indicate that thermal O+ precipitation can have a significant impact on Titan's ionosphere.
Lanthanoid titanate film structure deposited at different temperatures in vacuum
International Nuclear Information System (INIS)
Kushkov, V.D.; Zaslavskij, A.M.; Mel'nikov, A.V.; Zverlin, A.V.; Slivinskaya, A.Eh.
1991-01-01
Influence of deposition temperature on the structure of lanthanoid titanate films, prepared by the method of high-rate vacuum condensation. It is shown that formation of crystal structure, close to equilibrium samples, proceeds at 1100-1300 deg C deposition temperatures. Increase of temperature in this range promotes formation of films with higher degree of structural perfection. Amorphous films of lanthanoid titanates form at 200-1000 deg C. Deposition temperature shouldn't exceed 1400 deg C to prevent the formation of perovskite like phases in films
International Nuclear Information System (INIS)
Harmens, H.; Norris, D.A.; Cooper, D.M.; Mills, G.; Steinnes, E.; Kubin, E.; Thoeni, L.; Aboal, J.R.; Alber, R.; Carballeira, A.; Coskun, M.; De Temmerman, L.; Frolova, M.; Gonzalez-Miqueo, L.
2011-01-01
In 2005/6, nearly 3000 moss samples from (semi-)natural location across 16 European countries were collected for nitrogen analysis. The lowest total nitrogen concentrations in mosses ( 2 = 0.91) linear relationship was found between the total nitrogen concentration in mosses and measured site-specific bulk nitrogen deposition rates. The total nitrogen concentrations in mosses complement deposition measurements, helping to identify areas in Europe at risk from high nitrogen deposition at a high spatial resolution. - Highlights: → Nitrogen concentrations in mosses were determined at ca. 3000 sites across Europe. → Moss concentrations were compared with EMEP modelled nitrogen deposition. → The asymptotic relationship for Europe showed saturation at ca. 15 kg N ha -1 y -1 . → Linear relationships were found with measured nitrogen deposition in some countries. → Moss concentrations complement deposition measurements at high spatial resolution. - Mosses as biomonitors of atmospheric nitrogen deposition in Europe.
Effect of water chemistry on deposition for PWR plant operation
International Nuclear Information System (INIS)
Le Calvar, Marc; Bretelle, J. L.; Cailleaux, J. P.; Lacroix, R.; Guivarch, M.; Gay, N.; Taunier, S.; Gressier, F.; Varry, P.; Corredera, G.; Alos-Ramos, O.; Dijoux, M.
2012-09-01
For Pressurized Water Reactor (PWR) operation, water chemistry guidelines, specifications and associated surveillance programs are key to avoid deposition of oxides. Deposition of oxides can be detrimental by disrupting results of flow measurements, decreasing the thermal exchange capacity, or even by impairing safety. This paper describes the most important cases of deposition, their consequences for operation, and the implemented improvements to avoid their reoccurrence. Deposition that led to a Crud Induced Power Shift (CIPS) is also described. In the primary and in the secondary sides, orifice plates are typically used for measuring feedwater flow rate in nuclear power plants. Feedwater flow rates are used for control purposes and are important safety parameters as they are used to determine the plant's operating power level. Fouling of orifice plates in the primary side has been found during surveillance testing. For reactor coolant pumps, the formation of deposits on the seal No.1 can cause abnormally high or low leak rates through the seal. The leak rate through this seal must be carefully maintained within a prescribed range during plant operation. In the secondary side, orifice plate fouling has been the cause of feedwater flow/reference thermal power drift. For the steam generators (SG), magnetite deposition has led to fouling of the tube bundle, clogging of the quadri-foiled support plate holes and hard sludge formation on the base plate. For the generators, copper hollow conductors are widely used. Buildup of copper oxides on the interior walls of copper conductors has caused insufficient heat transfer. All these deposition cases have received adequate attention, understanding and response via improvement of our surveillance programs. (authors)
High burn rate solid composite propellants
Manship, Timothy D.
High burn rate propellants help maintain high levels of thrust without requiring complex, high surface area grain geometries. Utilizing high burn rate propellants allows for simplified grain geometries that not only make production of the grains easier, but the simplified grains tend to have better mechanical strength, which is important in missiles undergoing high-g accelerations. Additionally, high burn rate propellants allow for a higher volumetric loading which reduces the overall missile's size and weight. The purpose of this study is to present methods of achieving a high burn rate propellant and to develop a composite propellant formulation that burns at 1.5 inches per second at 1000 psia. In this study, several means of achieving a high burn rate propellant were presented. In addition, several candidate approaches were evaluated using the Kepner-Tregoe method with hydroxyl terminated polybutadiene (HTPB)-based propellants using burn rate modifiers and dicyclopentadiene (DCPD)-based propellants being selected for further evaluation. Propellants with varying levels of nano-aluminum, nano-iron oxide, FeBTA, and overall solids loading were produced using the HTPB binder and evaluated in order to determine the effect the various ingredients have on the burn rate and to find a formulation that provides the burn rate desired. Experiments were conducted to compare the burn rates of propellants using the binders HTPB and DCPD. The DCPD formulation matched that of the baseline HTPB mix. Finally, GAP-plasticized DCPD gumstock dogbones were attempted to be made for mechanical evaluation. Results from the study show that nano-additives have a substantial effect on propellant burn rate with nano-iron oxide having the largest influence. Of the formulations tested, the highest burn rate was a 84% solids loading mix using nano-aluminum nano-iron oxide, and ammonium perchlorate in a 3:1(20 micron: 200 micron) ratio which achieved a burn rate of 1.2 inches per second at 1000
Soil N chemistry in oak forests along a nitrogen deposition gradient
DEFF Research Database (Denmark)
Nilsson, Lars Ola; Wallander, Håkan; Bååth, Erland
2006-01-01
values of grass and uppermost soil layers indicate increased nitrification rates in high N deposition sites, but no large downward movements of NO3 in these soils. Only a few sites had NO-3 concentrations exceeding 1 mg N l-¹ in soil solution at 50 cm depth, which showed that N deposition to these acid...
Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
Macco, B.; Knoops, H.C.M.; Verheijen, M.A.; Beyer, W.; Creatore, M.; Kessels, W.M.M.
2017-01-01
In this work, atomic layer deposition (ALD) has been employed to prepare high-mobility H-doped zinc oxide (ZnO:H) films. Hydrogen doping was achieved by interleaving the ZnO ALD cycles with H2 plasma treatments. It has been shown that doping with H2 plasma offers key advantages over traditional
Monetary determinants of deposit euroization in European post-transition countries
Directory of Open Access Journals (Sweden)
Tkalec Marina
2013-01-01
Full Text Available This paper investigates the long-run and short-run relationship between deposit euroization in twelve European post-transition economies and two determinants of deposit euroization that are under the influence of monetary policy: the exchange rate and the interest rate differential. The link between deposit euroization, exchange rates and interest rate differentials is investigated using Johansen cointegration and error correction models for each country separately. The results suggest that changes in both monetary drivers have significant effects on deposit euroization and are therefore important for explaining and fighting deposit euroization. Differences between exchange rate regimes, fixed and managed vs. floating, seem to matter for deposit euroization.
Ren, Guofeng; Zhang, Ruibo; Fan, Zhaoyang
2018-05-01
With the fully exposed graphene edges, high conductivity and large surface area, edge oriented graphene foam (EOGF), prepared by deposition of perpendicular graphene network encircling the struts of Ni foam, is a superior scaffold to support active materials for electrochemical applications. With VO2 as an example, EOGF loaded VO2 nanoparticle (VO2/EOGF) electrode has high rate performance as cathode in lithium ion batteries (LIBs). In addition to the Li+ intercalation into the lattice, contribution of non-diffusion-limited pseudocapacitance to the capacity is prominent at high rates. VO2/EOGF based supercapacitor also exhibits fast response, with a characteristic frequency of 15 Hz when the phase angle reaches -45°, or a relaxation time constant of 66.7 ms. These results suggest the promising potential of EOGF as a scaffold in supporting active nanomaterials for electrochemical energy storage and other applications.
High 210Po atmospheric deposition flux in the subtropical coastal area of Japan
International Nuclear Information System (INIS)
Tateda, Yutaka; Iwao, Kenji
2008-01-01
Bulk atmospheric deposition fluxes of 210 Po and 210 Pb were measured at three coastal regions of Japan, the Pacific Ocean coastal area of the Japanese mainland (Odawa Bay), the Chinese continental side of Japanese coastal area (Tsuyazaki), and an isolated island near Okinawa (Akajima). Wet and dry fallout collectors were continuously deployed from September 1997 through August 1998 for periods of 3 to 31 days depending on the frequency of precipitation events. Annual 210 Pb deposition fluxes at Odawa Bay (35 o N 139 o E), Tsuyazaki (33 o N 130 o E) and Akajima (26 o N 127 o E) were 73.3 ± 8.0, 197 ± 35 and 78.5 ± 8.0 Bq m -2 y -1 , respectively. Higher 210 Pb deposition was observed at the Chinese continental side of Japanese coast than at the Pacific Ocean coastal site. The high 210 Pb atmospheric flux at the Chinese continental side coast was thought to be attributable to 222 Rn-rich air-mass transport from the Chinese continent during the winter monsoon. In contrast, the annual 210 Po deposition fluxes at the three study sites were 13.0 ± 2.3 (Odawa Bay), 21.9 ± 4.4 (Tsuyazaki) and 58.4 ± 7.7 (Akajima) Bq m -2 y -1 , respectively, indicating unusual high 210 Po deposition at Akajima during winter. Anomalous unsupported 210 Po input was observed during summer 1997, suggesting unknown source of 210 Po at this area
Directory of Open Access Journals (Sweden)
Y. Mao
2017-01-01
Full Text Available Yttrium oxide thin films were prepared by reactive magnetron sputtering in different deposition condition with various oxygen flow rates. The annealing influence on the yttrium oxide film microstructure is investigated. The oxygen flow shows a hysteresis behavior on the deposition rate. With a low oxygen flow rate, the so called metallic mode process with a high deposition rate (up to 1.4µm/h was achieved, while with a high oxygen flow rate, the process was considered to be in the poisoned mode with an extremely low deposition rate (around 20nm/h. X-ray diffraction (XRD results show that the yttrium oxide films that were produced in the metallic mode represent a mixture of different crystal structures including the metastable monoclinic phase and the stable cubic phase, while the poisoned mode products show a dominating monoclinic phase. The thin films prepared in metallic mode have relatively dense structures with less porosity. Annealing at 600 °C for 15h, as a structure stabilizing process, caused a phase transformation that changes the metastable monoclinic phase to stable cubic phase for both poisoned mode and metallic mode. The composition of yttrium oxide thin films changed from nonstoichiometric to stoichiometric together with a lattice parameter variation during annealing process. For the metallic mode deposition however, cracks were formed due to the thermal expansion coefficient difference between thin film and the substrate material which was not seen in poisoned mode deposition. The yttrium oxide thin films that deposited in different modes give various application options as a nuclear material.
High voltage holding in the negative ion sources with cesium deposition
Energy Technology Data Exchange (ETDEWEB)
Belchenko, Yu.; Abdrashitov, G.; Ivanov, A.; Sanin, A.; Sotnikov, O., E-mail: O.Z.Sotnikov@inp.nsk.su [Budker Institute of Nuclear Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk (Russian Federation)
2016-02-15
High voltage holding of the large surface-plasma negative ion source with cesium deposition was studied. It was found that heating of ion-optical system electrodes to temperature >100 °C facilitates the source conditioning by high voltage pulses in vacuum and by beam shots. The procedure of electrode conditioning and the data on high-voltage holding in the negative ion source with small cesium seed are described. The mechanism of high voltage holding improvement by depletion of cesium coverage is discussed.
Vázquez-Urbez, M.; Arenas, C.; Sancho, C.; Osácar, C.; Auqué, L.; Pardo, G.
2010-07-01
The tufa record and hydrochemical characteristics of the River Piedra in the Monasterio de Piedra Natural Park (NE Spain) were studied for 6 years. The mean discharge of this river was 1.22 m3/s. The water was supersaturated with calcium carbonate. The HCO3 -, Ca2+ and TDIC concentrations decreased along the 0.5-km-long studied stretch, whereas the calcite SI showed no systematic downstream or seasonal variation over the same stretch. Several sedimentary subenvironments exist in which four broad types of tufa facies form: (1) Dense laminated tufa (stromatolites), (2) Dense to porous, massive tufa, (3) Porous, coarsely laminated tufa with bryophytes and algae, and (4) Dense, hard, laminated deposits in caves. The half-yearly period thickness and weight of sediment accumulated on 14 tablets installed in several subenvironments showed that the deposition rate was greater in fast flowing river areas and in stepped waterfalls, and lower in slow flowing or standing river areas and in spray and splash areas. Mechanical CO2 outgassing is the main factor controlling calcite precipitation on the river bed and in waterfalls, but this process does not explain the seasonal changes in depositional rates. The deposition rates showed a half-yearly period pattern recorded in all fluvial subenvironments persistent over time (5.26 mm, 0.86 g/cm2 in warm periods; 2.26 mm, 0.13 g/cm2 in cool periods). Mass balance calculations showed higher calcite mass values in warm (21.58 mg/L) than in cool (13.68 mg/L) periods. This biannual variation is mainly attributed to the seasonal differences in temperature that caused changes in inorganic calcite precipitation rate and in biomass and the correlative photosynthetic activity. Tufa sedimentation was therefore controlled by both physicochemical and biological processes. The results of this study may help test depositional rates and their environmental controls and thus assess the climatic and hydrological significance of ancient tufas in semi
Directory of Open Access Journals (Sweden)
Aboozar eMosleh
2015-04-01
Full Text Available Germanium tin alloys were grown directly on Si substrate at low temperatures using a cold-wall ultra-high vacuum chemical vapor deposition system. Epitaxial growth was achieved by adopting commercial gas precursors of germane and stannic chloride without any carrier gases. The X-ray diffraction analysis showed the incorporation of Sn and that the Ge1-xSnx films are fully epitaxial and strain relaxed. Tin incorporation in the Ge matrix was found to vary from 1% to 7%. The scanning electron microscopy images and energy dispersive X-ray spectra maps show uniform Sn incorporation and continuous film growth. Investigation of deposition parameters shows that at high flow rates of stannic chloride the films were etched due to the production of HCl. The photoluminescence study shows the reduction of bandgap from 0.8 eV to 0.55 eV as a result of Sn incorporation.
Biological response of Tradescantia stamen-hairs in Brazilian radioactive waste deposits
International Nuclear Information System (INIS)
Gomes, Heliana A.; Macacini, Jose Flavio
2005-01-01
The objective of the present study was to apply a highly sensitive botanical test of mutagenicity (the Tradescantia stamen-hair mutation bioassay), to assess in situ the biological responses induced by occurring radiation in Brazilian radioactive waste deposits (waste deposits from the Mineral Treatment Unit/Brazilian Nuclear Industries (UTM/INB), from the Centro de Desenvolvimento de Tecnologia Nuclear (CDTN) and from the Instituto de Pesquisas Energeticas e Nucleares (IPEN). The mutagenesis was evaluated in environments presenting gamma radiation exposure rates ranging from 1.6 μR.min -1 up to 3300.0 μR.min -1 . It was detected a significant increase in the mutation rate for pink Tradescantia stamen-hair only for the local presenting the highest exposition rate within UTM/INB which had a radiation exposition rate of 750 μR.min -1 . The Tradescantia plants exposed to the radioactive waste deposits from CDTN and IPEN presented an insufficient number of flowers for the statistical evaluation of mutagenicity. (author)
Unstacked double-layer templated graphene for high-rate lithium-sulphur batteries
Zhao, Meng-Qiang; Zhang, Qiang; Huang, Jia-Qi; Tian, Gui-Li; Nie, Jing-Qi; Peng, Hong-Jie; Wei, Fei
2014-03-01
Preventing the stacking of graphene is essential to exploiting its full potential in energy-storage applications. The introduction of spacers into graphene layers always results in a change in the intrinsic properties of graphene and/or induces complexity at the interfaces. Here we show the synthesis of an intrinsically unstacked double-layer templated graphene via template-directed chemical vapour deposition. The as-obtained graphene is composed of two unstacked graphene layers separated by a large amount of mesosized protuberances and can be used for high-power lithium-sulphur batteries with excellent high-rate performance. Even after 1,000 cycles, high reversible capacities of ca. 530 mA h g-1 and 380 mA h g-1 are retained at 5 C and 10 C, respectively. This type of double-layer graphene is expected to be an important platform that will enable the investigation of stabilized three-dimensional topological porous systems and demonstrate the potential of unstacked graphene materials for advanced energy storage, environmental protection, nanocomposite and healthcare applications.
The crystallization and properties of sputter deposited lithium niobite
Energy Technology Data Exchange (ETDEWEB)
Shank, Joshua C.; Brooks Tellekamp, M.; Alan Doolittle, W., E-mail: alan.doolittle@ece.gatech.edu
2016-06-30
Sputter deposition of the thin film memristor material, lithium niobite (LiNbO{sub 2}) is performed by co-deposition from a lithium oxide (Li{sub 2}O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO{sub 2}. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO{sub 2} films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. - Highlights: • Room temperature sputter deposition of crystalline lithium niobite (LiNbO{sub 2}) • Contrast with previous high temperature corrosive growth methods • Analysis of sputter deposition parameters on the chemical and physical properties of the deposited material.
The crystallization and properties of sputter deposited lithium niobite
International Nuclear Information System (INIS)
Shank, Joshua C.; Brooks Tellekamp, M.; Alan Doolittle, W.
2016-01-01
Sputter deposition of the thin film memristor material, lithium niobite (LiNbO_2) is performed by co-deposition from a lithium oxide (Li_2O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO_2. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO_2 films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. - Highlights: • Room temperature sputter deposition of crystalline lithium niobite (LiNbO_2) • Contrast with previous high temperature corrosive growth methods • Analysis of sputter deposition parameters on the chemical and physical properties of the deposited material
Stratigraphy of the north polar layered deposits of Mars from high-resolution topography
Becerra, Patricio; Byrne, Shane; Sori, Michael M.; Sutton, Sarah; Herkenhoff, Kenneth E.
2016-01-01
The stratigraphy of the layered deposits of the polar regions of Mars is theorized to contain a record of recent climate change linked to insolation changes driven by variations in the planet's orbital and rotational parameters. In order to confidently link stratigraphic signals to insolation periodicities, a description of the stratigraphy is required based on quantities that directly relate to intrinsic properties of the layers. We use stereo Digital Terrain Models (DTMs) from the High Resolution Imaging Science Experiment (HiRISE) to derive a characteristic of North Polar Layered Deposits (NPLD) strata that can be correlated over large distances: the topographic protrusion of layers exposed in troughs, which is a proxy for the layers’ resistance to erosion. Using a combination of image analysis and a signal-matching algorithm to correlate continuous depth-protrusion signals taken from DTMs at different locations, we construct a stratigraphic column that describes the upper ~500 m of at least 7% of the area of the NPLD, and find accumulation rates that vary by factors of up to two. We find that, when coupled with observations of exposed layers in orbital images, the topographic expression of the strata is consistently continuous through large distances in the top 300 – 500 m of the NPLD, suggesting it is better related to intrinsic layer properties than brightness alone.
A climate signal in exhumation patterns revealed by porphyry copper deposits
Yanites, Brian J.; Kesler, Stephen E.
2015-06-01
The processes that build and shape mountain landscapes expose important mineral resources. Mountain landscapes are widely thought to result from the interaction between tectonic uplift and exhumation by erosion. Both climate and tectonics affect rates of exhumation, but estimates of their relative importance vary. Porphyry copper deposits are emplaced at a depth of about 2 km in convergent tectonic settings; their exposure at the surface therefore can be used to track landscape exhumation. Here we analyse the distribution, ages and spatial density of exposed Cenozoic porphyry copper deposits using a global data set to quantify exhumation. We find that the deposits exhibit young ages and are sparsely distributed--both consistent with rapid exhumation--in regions with high precipitation, and deposits are older and more abundant in dry regions. This suggests that climate is driving erosion and mineral exposure in deposit-bearing mountain landscapes. Our findings show that the emplacement ages of porphyry copper deposits provide a means to estimate long-term exhumation rates in active orogens, and we conclude that climate-driven exhumation influences the age and abundance of exposed porphyry copper deposits around the world.
Deposit Probe Measurements in Danish Grate and Pulverized Fuel Biomass Power Boilers
DEFF Research Database (Denmark)
Hansen, Stine Broholm; Jensen, Peter Arendt; Jappe Frandsen, Flemming
2012-01-01
. Corresponding samples of fuels, ash deposits and fly ash have provided information on the transformation of inorganics in the boiler. Generally, grate fired boilers provide a fly ash containing high contents of K, Cl and S compared to the fuel ash, while suspension fired boilers fly ash has a composition nearly...... similar to the fuel ash. Inner most biomass deposits are always salt-rich, while thicker deposit layers also contain some Si and Ca. Deposit probe formation rate measurements have been performed in different ways on several boilers. Grate and suspension fired boilers seems to cause similar deposit...... formation rates. Suspension fired boilers generate more fly ash, while grate boilers form a fly ash with a higher fraction of melt formation (and thereby a higher sticking probability) at similar temperatures. For suspension fired units it is observed that wood with a lower ash content than straw gives rise...
Twichell, David C.; Kenyon, Neil H.; Parson, Lindsay M.; McGregor, Bonnie A.
1991-01-01
GLORIA long-range side-scan sonar imagery and 3.5-kHz seismic-reflection profiles depict a series of nine elongate deposits with generally high-backscatter surfaces covering most of the latest fanlobe sequence of the Mississippi Fan in the eastern Gulf of Mexico. The youngest deposit is a “slump” that covers a 250 by 100 km area of the middle and upper fan. The remaining mapped deposits, termed depositional lobes, are long (as much as 200 km) and relatively thin (less than 35 m thick) bodies. Small channels and lineations on the surface of many of these depositional lobes radiate from a single, larger main channel that is the conduit through which sediment has been supplied to these surficial deposits on the fan. The 3.5-kHz profiles show that adjacent depositional lobes overlap one another rather than interfingering, indicating that only one lobe was an active site of deposition at a time. Shifting of the depositional sites appears to be caused by both aggradation and avulsion. The chronology developed from the overlapping relations indicates the oldest of the mapped depositional lobes are on the lowermost fan, and the youngest are further up the fan. Depositional lobes on the lower fan consist of a series of smaller, elongate features with high-backscatter surfaces (540 km in length) located at the ends of previously unrecognized small channels (turbidity currents and/or debris flows, sand flows, or mud flows appear to be the dominant transport process constructing these depositional lobes. Channelized flow is an important mechanism for transporting sediment away from the main channel on this fan and the resulting facies created by these small flows are laterally discontinuous.
International Nuclear Information System (INIS)
Balashazy, I.; Palfalvi, J.; Hofmann, W.
2000-01-01
local inhomogeneities for all particle sizes and flow rates considered here (except for nanometer-sized particles at very low flow rates). The maximum values of the enhancement factors in a bifurcation strongly increased with decreasing patch size, thus illustrating the high degree of inhomogeneities of the deposition patterns in upper human airways. The computed maximum enhancement factors were as high as several hundreds, suggesting that epithelial cells located at these sites will receive massive doses relative to the assumption of a uniform nuclide distribution. Since the prevalent philosophy of inhalation risk assessment is based upon the assumption of a uniform particle deposition pattern, the incorporation of deposition enhancement factors within airway bifurcations will provide more realistic estimates of radiation doses and resulting carcinogenic risk. Such microdosimetric considerations are particularly important for inhaled alpha-emitting radionuclides, such as the short-lived radon progeny, where cellular doses are strongly correlated with the emission sites of alpha particles. (author)
Airborne particles are implicated in morbidity and mortality of certain high-risk subpopulations. Exposure to particles occurs mostly indoors, where a main removal mechanism is deposition to surfaces. Deposition can be affected by the use of forced- air circulation through duct...
Granath, Gustaf; Strengbom, Joachim; Breeuwer, Angela; Heijmans, Monique M P D; Berendse, Frank; Rydin, Håkan
2009-04-01
Increased N deposition in Europe has affected mire ecosystems. However, knowledge on the physiological responses is poor. We measured photosynthetic responses to increasing N deposition in two peatmoss species (Sphagnum balticum and Sphagnum fuscum) from a 3-year, north-south transplant experiment in northern Europe, covering a latitudinal N deposition gradient ranging from 0.28 g N m(-2) year(-1) in the north, to 1.49 g N m(-2) year(-1) in the south. The maximum photosynthetic rate (NP(max)) increased southwards, and was mainly explained by tissue N concentration, secondly by allocation of N to the photosynthesis, and to a lesser degree by modified photosystem II activity (variable fluorescence/maximum fluorescence yield). Although climatic factors may have contributed, these results were most likely attributable to an increase in N deposition southwards. For S. fuscum, photosynthetic rate continued to increase up to a deposition level of 1.49 g N m(-2) year(-1), but for S. balticum it seemed to level out at 1.14 g N m(-2) year(-1). The results for S. balticum suggested that transplants from different origin (with low or intermediate N deposition) respond differently to high N deposition. This indicates that Sphagnum species may be able to adapt or physiologically adjust to high N deposition. Our results also suggest that S. balticum might be more sensitive to N deposition than S. fuscum. Surprisingly, NP(max) was not (S. balticum), or only weakly (S. fuscum) correlated with biomass production, indicating that production is to a great extent is governed by factors other than the photosynthetic capacity.
Eits, R.M.; Kwakkel, R.P.; Verstegen, M.W.A.; Stoutjesdijk, P.; Greef, de K.H.
2002-01-01
Two experiments of similar design were conducted with male broiler chickens over two body weight ranges, 200 to 800 g in Experiment 1 and 800 to 1,600 g in Experiment 2. The data were used to test the hypothesis that protein deposition rate increases (linearly) with increasing amino acid intake,
Shen, Jianlin; Chen, Deli; Bai, Mei; Sun, Jianlei; Lam, Shu Kee; Mosier, Arvin; Liu, Xinliang; Li, Yong
2018-03-01
Cattle feedlots are significant ammonia (NH3) emission sources, and cause high NH3 deposition. This study was conducted to investigate the responses of soil mineral nitrogen (N), percent cover of plant species, leaf N content, and leaf δ15N to NH3 deposition around a 17,500-head cattle feedlot in Victoria, Australia. Soil samples were collected in May 2015 at 100-m intervals along eight downwind transects, and plant samples were collected in June 2015 from five sites at 50- to 300-m intervals along a grassland transect within 1 km downwind of the feedlot. NH3 deposition was also monitored at five sites within 1 km downwind of the feedlot. The estimated NH3-N deposition rates ranged from 2.9 kg N ha-1 yr-1 at 1 km from the feedlot to 203 kg N ha-1 yr-1 at 100 m from the feedlot. The soil mineral N content was high (22-98 mg kg-1, mainly nitrate), significantly decreased with increasing distance from the feedlot, and significantly increased with increasing NH3-N deposition. With increasing NH3-N deposition, the percent cover of the herb species Cymbonotus lawsonianus increased significantly, but that of the grass species Microlaena stipoides decreased significantly. The leaf total N contents of the grass and herb species were high (>4%), and were linearly, positively correlated with the NH3-N deposition rate. Leaf δ15N values were linearly, negatively correlated with the N deposition rate. These results indicate that the leaf N contents and δ15N values of C. lawsonianus and M. stipoides may be bioindicators of N deposition.
Pierson, B. K.; Parenteau, M. N.; Griffin, B. M.
1999-01-01
At Chocolate Pots Hot Springs in Yellowstone National Park the source waters have a pH near neutral, contain high concentrations of reduced iron, and lack sulfide. An iron formation that is associated with cyanobacterial mats is actively deposited. The uptake of [(14)C]bicarbonate was used to assess the impact of ferrous iron on photosynthesis in this environment. Photoautotrophy in some of the mats was stimulated by ferrous iron (1.0 mM). Microelectrodes were used to determine the impact of photosynthetic activity on the oxygen content and the pH in the mat and sediment microenvironments. Photosynthesis increased the oxygen concentration to 200% of air saturation levels in the top millimeter of the mats. The oxygen concentration decreased with depth and in the dark. Light-dependent increases in pH were observed. The penetration of light in the mats and in the sediments was determined. Visible radiation was rapidly attenuated in the top 2 mm of the iron-rich mats. Near-infrared radiation penetrated deeper. Iron was totally oxidized in the top few millimeters, but reduced iron was detected at greater depths. By increasing the pH and the oxygen concentration in the surface sediments, the cyanobacteria could potentially increase the rate of iron oxidation in situ. This high-iron-content hot spring provides a suitable model for studying the interactions of microbial photosynthesis and iron deposition and the role of photosynthesis in microbial iron cycling. This model may help clarify the potential role of photosynthesis in the deposition of Precambrian banded iron formations.
Rate Control in Dual Source Evaporation
Wielinga, T.; Gruisinga, W.; Leeuwis, H.; Lodder, J.C.; van Weers, J.F.; Wilmans, J.C.
1980-01-01
Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used
Sun, Kainan; Steck, Daniel J.; Field, R. William
2009-01-01
The quantitative relationships between radon gas concentration, the surface-deposited activities of various radon progeny, the airborne radon progeny dose rate, and various residential environmental factors were investigated through actual field measurements in 38 selected Iowa houses occupied by either smokers or nonsmokers. Airborne dose rate was calculated from unattached and attached potential alpha energy concentrations (PAECs) using two dosimetric models with different activity-size weighting factors. These models are labeled Pdose and Jdose, respectively. Surface-deposited 218Po and 214Po were found significantly correlated to radon, unattached PAEC, and both airborne dose rates (p fireplace, or usage of a ceiling fan significantly, or marginal significantly, reduced the Pdose to 0.65 (90% CI 0.42–0.996), 0.54 (90% CI 0.28–1.02) and 0.66 (90% CI 0.45–0.96), respectively. For Jdose, only the usage of a ceiling fan significantly reduced the dose rate to 0.57 (90% CI 0.39–0.85). In smoking environments, deposited 218Po was a significant negative predictor for Pdose (RR 0.68, 90% CI 0.55–0.84) after adjusting for long-term 222Rn and environmental factors. A significant decrease of 0.72 (90% CI 0.64–0.83) in the mean Pdose was noted, after adjusting for the radon and radon progeny effects and other environmental factors, for every 10 increasing cigarettes smoked in the room. A significant increase of 1.71 in the mean Pdose was found for large room size relative to small room size (90% CI 1.08–2.79) after adjusting for the radon and radon progeny effects as well as other environmental factors. Fireplace usage was found to significantly increase the mean Pdose to 1.71 (90% CI 1.20–2.45) after adjusting for other factors. PMID:19590273
Energy Technology Data Exchange (ETDEWEB)
Miller, C.W.; Sjoreen, A.L.; Begovich, C.L.; Hermann, O.W.
1986-11-01
This code estimates concentrations in air and ground deposition rates for Atmospheric Nuclides Emitted from Multiple Operating Sources. ANEMOS is one component of an integrated Computerized Radiological Risk Investigation System (CRRIS) developed for the US Environmental Protection Agency (EPA) for use in performing radiological assessments and in developing radiation standards. The concentrations and deposition rates calculated by ANEMOS are used in subsequent portions of the CRRIS for estimating doses and risks to man. The calculations made in ANEMOS are based on the use of a straight-line Gaussian plume atmospheric dispersion model with both dry and wet deposition parameter options. The code will accommodate a ground-level or elevated point and area source or windblown source. Adjustments may be made during the calculations for surface roughness, building wake effects, terrain height, wind speed at the height of release, the variation in plume rise as a function of downwind distance, and the in-growth and decay of daughter products in the plume as it travels downwind. ANEMOS can also accommodate multiple particle sizes and clearance classes, and it may be used to calculate the dose from a finite plume of gamma-ray-emitting radionuclides passing overhead. The output of this code is presented for 16 sectors of a circular grid. ANEMOS can calculate both the sector-average concentrations and deposition rates at a given set of downwind distances in each sector and the average of these quantities over an area within each sector bounded by two successive downwind distances. ANEMOS is designed to be used primarily for continuous, long-term radionuclide releases. This report describes the models used in the code, their computer implementation, the uncertainty associated with their use, and the use of ANEMOS in conjunction with other codes in the CRRIS. A listing of the code is included in Appendix C.
International Nuclear Information System (INIS)
Miller, C.W.; Sjoreen, A.L.; Begovich, C.L.; Hermann, O.W.
1986-11-01
This code estimates concentrations in air and ground deposition rates for Atmospheric Nuclides Emitted from Multiple Operating Sources. ANEMOS is one component of an integrated Computerized Radiological Risk Investigation System (CRRIS) developed for the US Environmental Protection Agency (EPA) for use in performing radiological assessments and in developing radiation standards. The concentrations and deposition rates calculated by ANEMOS are used in subsequent portions of the CRRIS for estimating doses and risks to man. The calculations made in ANEMOS are based on the use of a straight-line Gaussian plume atmospheric dispersion model with both dry and wet deposition parameter options. The code will accommodate a ground-level or elevated point and area source or windblown source. Adjustments may be made during the calculations for surface roughness, building wake effects, terrain height, wind speed at the height of release, the variation in plume rise as a function of downwind distance, and the in-growth and decay of daughter products in the plume as it travels downwind. ANEMOS can also accommodate multiple particle sizes and clearance classes, and it may be used to calculate the dose from a finite plume of gamma-ray-emitting radionuclides passing overhead. The output of this code is presented for 16 sectors of a circular grid. ANEMOS can calculate both the sector-average concentrations and deposition rates at a given set of downwind distances in each sector and the average of these quantities over an area within each sector bounded by two successive downwind distances. ANEMOS is designed to be used primarily for continuous, long-term radionuclide releases. This report describes the models used in the code, their computer implementation, the uncertainty associated with their use, and the use of ANEMOS in conjunction with other codes in the CRRIS. A listing of the code is included in Appendix C
Deyell, C.L.; Leonardson, R.; Rye, R.O.; Thompson, J.F.H.; Bissig, T.; Cooke, D.R.
2005-01-01
The Pascua-Lama high-sulfidation system, located in the El Indio-Pascua belt of Chile and Argentina, contains over 16 million ounces (Moz) Au and 585 Moz Ag. The deposit is hosted primarily in granite rocks of Triassic age with mineralization occurring in several discrete Miocene-age phreatomagmatic breccias and related fracture networks. The largest of these areas is Brecha Central, which is dominated by a mineralizing assemblage of alunite-pyrite-enargite and precious metals. Several stages of hydrothermal alteration related to mineralization are recognized, including all types of alunite-bearing advanced argillic assemblages (magmatic-hydrothermal, steam-heated, magmatic steam, and supergene). The occurrence of alunite throughout the paragenesis of this epithermal system is unusual and detailed radiometric, mineralogical, and stable isotope studies provide constraints on the timing and nature of alteration and mineralization of the alunite-pyiite-enargite assemblage in the deposit. Early (preore) alteration occurred prior to ca. 9 Ma and consists of intense silicic and advanced argillic assemblages with peripheral argillic and widespread propylitic zones. Alunite of this stage occurs as fine intergrowths of alunite-quartz ?? kaolinite, dickite, and pyrophyllite that selectively replaced feldspars in the host rock. Stable isotope systematics suggest a magmatic-hydrothermal origin with a dominantly magmatic fluid source. Alunite is coeval with the main stage of Au-Ag-Cu mineralization (alunite-pyrite-enargite assemblage ore), which has been dated at approximately 8.8 Ma. Ore-stage alunite has an isotopic signature similar to preore alunite, and ?? 34Salun-py data indicate depositional temperatures of 245?? to 305??C. The ??D and ?? 18O data exclude significant involvement of meteoric water during mineralization and indicate that the assemblage formed from H2S-dominated magmatic fluids. Thick steam-heated alteration zones are preserved at the highest elevations in
Rapid Solidification of a New Generation Aluminum-Lithium Alloy via Electrospark Deposition
Heard, David W.; Boselli, Julien; Gauvin, Raynald; Brochu, Mathieu
Electrospark deposition (ESD) is a rapid solidification processing technique capable of depositing a metal onto a conductive substrate. The short pulse duration and high pulse frequency, combined with the small amount of material transferred during each pulse, results in high cooling rates being realized, on the order of 105-106 C/sec. This study investigates the ability to induce solute trapping behavior, for a new generation aluminum-lithium alloy, AA2199, using ESD.
Proportional chambers and multiwire drift chambers at high rates
International Nuclear Information System (INIS)
Walenta, A.H.
1977-01-01
The high event and particle rates expected for ISABELLE intersecting storage rings raise the question whether PWC's and drift chambers, now widely in use in experiments, still can operate under such conditions. Various effects depend on the number of avalanches produced per length of wire N and the size of the avalanche Q, i.e., on the number of positive ions created in an avalanche. Therefore the important parameter for the following discussion is the product QN. The minimum Q is determined by the type and noise level of preamplifiers used. Examples are given for a typical low noise amplifier as well as for a typical integrated ''cheap'' amplifier. The rate/wire length N depends on the chamber arrangement, wire spacing, etc. In multiwire drift chambers, a single wire shows space-charge effects reducing the pulse height by 1% at a rate of N = 7 x 10 3 mm -1 sec -1 . At a rate of N approximately equal to 10 5 mm -1 sec -1 an efficiency loss of the order of 1% was noticed. The aging effect due to deposits on the anode wire can be reduced using low noise amplifiers and low gas gain to such an extent that a lifetime of about half a year at ISABELLE can be expected. The use of conventional cheap preamplifiers will result in a typical lifetime of about 30 days. Improvements are probable. The time resolution of Δt/sub r/ = 4 nsec fwhm seems adequate for event rates of 10 7 sec -1 . The memory time Δt/sub m/ greater than or equal to 100 nsec may cause serious problems for pattern recognition depending on layout and readout. The use of induced signals on cathode pads, thus reading out shorter parts of the wire, can solve the problem
Spray deposition using impulse atomization technique
International Nuclear Information System (INIS)
Ellendt, N.; Schmidt, R.; Knabe, J.; Henein, H.; Uhlenwinkel, V.
2004-01-01
A novel technique, impulse atomization, has been used for spray deposition. This single fluid atomization technique leads to different spray characteristics and impact conditions of the droplets compared to gas atomization technique which is the common technique used for spray deposition. Deposition experiments with a Cu-6Sn alloy were conducted to evaluate the appropriateness of impulse atomization to produce dense material. Based on these experiments, a model has been developed to simulate the thermal history and the local solidification rates of the deposited material. A numerical study shows how different cooling conditions affect the solidification rate of the material
Co3O4 protective coatings prepared by Pulsed Injection Metal Organic Chemical Vapour Deposition
DEFF Research Database (Denmark)
Burriel, M.; Garcia, G.; Santiso, J.
2005-01-01
of deposition temperature. Pure Co3O4 spinel structure was found for deposition temperatures ranging from 360 to 540 degreesC. The optimum experimental parameters to prepare dense layers with a high growth rate were determined and used to prepare corrosion protective coatings for Fe-22Cr metallic interconnects......Cobalt oxide films were grown by Pulsed Injection Metal Organic Chemical Vapour Deposition (PI-MOCVD) using Co(acac)(3) (acac=acetylacetonate) precursor dissolved in toluene. The structure, morphology and growth rate of the layers deposited on silicon substrates were studied as a function......, to be used in Intermediate Temperature Solid Oxide Fuel Cells. (C) 2004 Elsevier B.V. All rights reserved....
Deposition and high temperature corrosion in a 10 MW straw
DEFF Research Database (Denmark)
Michelsen, Hanne Philbert; Frandsen, Flemming; Dam-Johansen, Kim
1998-01-01
Deposition and corrosion measurements were conducted at a 10 MW wheat straw fired stoker boiler used for combined power and heat production. The plant experiences major problems with deposits on the heat transfer surfaces, and test probes have shown enhanced corrosion due to selective corrosion...... for metal temperatures above 520 C. Deposition measurements carried out at a position equal to the secondary superheater showed deposits rich in potassium and chlorine and to a lesser extent in silicon, calcium, and sulfur. Potassium and chlorine make up 40-80 wt% of the deposits. Mechanisms of deposit...
The influence of the electrical asymmetry effect on deposition uniformity of thin silicon film
Energy Technology Data Exchange (ETDEWEB)
Hrunski, D., E-mail: Dzmitry.Hrunski@leyboldoptics.com; Janssen, A.; Fritz, T.; Hegemann, T.; Clark, C.; Schreiber, U.; Grabosch, G.
2013-04-01
The deposition of amorphous and microcrystalline silicon is an important step in the production of thin silicon film solar panels. Deposition rate, layer uniformity and material quality are key attributes for achieving high efficiency in such panels. Due to the multilayer structure of tandem solar cells (more than 6 thin silicon layers), it is becoming increasingly important to improve the uniformity of deposition without sacrificing deposition rate and material quality. This paper reports the results of an investigation into the influence of the electrical asymmetry effect (EAE) on the uniformity of deposited layers. 13.56 MHz + 27.12 MHz excitation frequencies were used for thin silicon film deposition in a Gen5 reactor (1100 × 1400 mm). To change the plasma properties, the DC self bias voltage on the RF electrode was varied by adjustment of the phase angle between the two frequencies applied. It was found that the layers deposited by EAE method have better uniformity than layers deposited in single frequency 27.12 MHz discharge. The EAE provides additional opportunities for improvement of uniformity, deposition rate and material quality. - Highlights: ► The electrical asymmetry effect technique tested for thin silicon film deposition ► Bias voltage has an influence on film uniformity. ► Minimized the deterioration of layer uniformity while increasing discharge frequency.
Energy Technology Data Exchange (ETDEWEB)
Xu Zhenhua [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Graduate School of Chinese Academy of Sciences, Beijing 100039 (China); Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); He Limin, E-mail: he_limin@yahoo.co [Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); Chen Xiaolong; Zhao Yu [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Graduate School of Chinese Academy of Sciences, Beijing 100039 (China); Cao Xueqiang, E-mail: xcao@ciac.jl.c [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China)
2010-10-15
Thermal barrier coatings (TBCs) have very important applications in gas turbines for higher thermal efficiency and protection of components at high temperature. TBCs of rare earth materials such as lanthanum zirconate (La{sub 2}Zr{sub 2}O{sub 7}, LZ), lanthanum cerate (La{sub 2}Ce{sub 2}O{sub 7}, LC), lanthanum cerium zirconate (La{sub 2}(Zr{sub 0.7}Ce{sub 0.3}){sub 2}O{sub 7}, LZ7C3) were prepared by electron beam-physical vapor deposition (EB-PVD). The composition, crystal structure, cross-sectional morphology and cyclic oxidation behavior of these coatings were studied. These coatings have partially deviated from their original compositions due to the different evaporation rates of oxides, and the deviation could be reduced by properly controlling the deposition condition. A double ceramic layer-thermal barrier coatings (DCL-TBCs) of LZ7C3 and LC could also be deposited with a single LZ7C3 ingot by properly controlling the deposition energy. LaAlO{sub 3} is formed due to the chemical reaction between LC and Al{sub 2}O{sub 3} in the thermally grown oxide (TGO) layer. The failure of DCL-TBCs is a result of the sintering-induced of LZ7C3 coating and the chemical incompatibility of LC and TGO. Since no single material that has been studied so far satisfies all the requirements for high temperature applications, DCL-TBCs are an important development direction of TBCs.
Deposit Probe Measurements in Large Biomass-Fired Grate Boilers and Pulverized-Fuel Boilers
DEFF Research Database (Denmark)
Hansen, Stine Broholm; Jensen, Peter Arendt; Jappe Frandsen, Flemming
2014-01-01
A number of full-scale deposit probe measuring campaigns conducted in grate-fired and suspension-fired boilers, fired with biomass, have been reviewed and compared. The influence of operational parameters on the chemistry of ash and deposits, on deposit build-up rates, and on shedding behavior has...... of the deposits formed is determined by the fly ash composition and the flue gas temperature; increases in the local flue gas temperature lead to higher contents of Si and Ca and lower contents of Cl in the deposits. The net deposit build-up rates in grate-fired and suspension-fired boilers are at similar levels....../wood-firing in suspension-fired boilers, shedding occurred by debonding with incomplete removal at flue gas temperatures of 600–1000 °C and by debonding with complete removal during wood-firing in suspension-fired boilers at high flue gas temperatures (1300 °C). Shedding events were not observed during wood suspension...
Evrard, Olivier; Chartin, Caroline; Onda, Yuichi; Patin, Jeremy; Lepage, Hugo; Lef?vre, Ir?ne; Ayrault, Sophie; Ottl?, Catherine; Bont?, Philippe
2013-01-01
Measurement of radioactive dose rates in fine sediment that has recently deposited on channel bed-sand provides a solution to address the lack of continuous river monitoring in Fukushima Prefecture after Fukushima Dai-ichi nuclear power plant (FDNPP) accident. We show that coastal rivers of Eastern Fukushima Prefecture were rapidly supplied with sediment contaminated by radionuclides originating from inland mountain ranges, and that this contaminated material was partly exported by typhoons t...
Surface deposition from radioactive plumes
International Nuclear Information System (INIS)
Garland, J.A.
1980-01-01
Accidents involving nuclear plants may release radioactive particles and gases to the atmosphere. Dry deposition of particles has been investigated mainly in the laboratory and a general understanding of the transfer mechanisms has been established. However there is apparently a substantial discrepancy between the few field observations of dry deposition of particles and laboratory measurements, particularly for 0.1 - 1 μm particles for which laboratory work shows very small deposition rates. In addition there are few estimates of deposition rates for forest and some other kinds of terrain. The most important gas in the context of a nuclear accident is I-131 and the behaviour of this gas at grass surfaces has received much attention. However smaller quantities of other gases and vapours may be released and the surface absorption of these species may require further investigation. In addition there is little knowledge of the behaviour of gases over many types of surface. The rate of deposition of particles and gases is influenced by many parameters including wind speed and the temperature stratification of the lower atmosphere. Conditions which give poor atmospheric dispersion usually give lower deposition velocities. Transfer to man depends on the availability of deposited materials on crops and grass. A wide range of isotopes including iodine and several metallic fission products are lost with a half life for residence on grass ranging from a few days to a few tens days, depending on climatic conditions
High-Rate Strong-Signal Quantum Cryptography
Yuen, Horace P.
1996-01-01
Several quantum cryptosystems utilizing different kinds of nonclassical lights, which can accommodate high intensity fields and high data rate, are described. However, they are all sensitive to loss and both the high rate and the strong-signal character rapidly disappear. A squeezed light homodyne detection scheme is proposed which, with present-day technology, leads to more than two orders of magnitude data rate improvement over other current experimental systems for moderate loss.
Sputter deposited titanium disilicide at high substrate temperatures
Tanielian, M.; Blackstone, S.; Lajos, R.
1984-08-01
Titanium disilicide films were sputter deposited from a composite TiSi2.1 target on bare silicon wafers both at room temperature and at 600 °C. The room temperature as-deposited films require a 900 °C sintering step to reduce their resistivity. On the other hand, the as-deposited 600 °C films are fully reacted, polycrystalline, have no oxygen contamination, large grain sizes, and are oxidation resistant. Further annealing of these films at 900 °C produces no changes in their crystal structure, composition, resistivity, or grain size.
Srinivas, D; Ramesh Babu, V; Patra, I; Tripathi, Shailesh; Ramayya, M S; Chaturvedi, A K
2017-02-01
The Atomic Minerals Directorate for Exploration and Research (AMD) has conducted high-resolution airborne gamma ray spectrometer (AGRS), magnetometer and time domain electromagnetic (TDEM) surveys for uranium exploration, along the northern margins of Cuddapah Basin. The survey area includes well known uranium deposits such as Lambapur-Peddagattu, Chitrial and Koppunuru. The AGRS data collected for uranium exploration is utilised for estimating the average absorbed rates in air due to radio-elemental (potassium in %, uranium and thorium in ppm) distribution over these known deposit areas. Further, portable gamma ray spectrometer (PGRS) was used to acquire data over two nearby locations one from Lambapur deposit, and the other from known anomalous zone and subsequently average gamma dose rates were estimated. Representative in-situ rock samples were also collected from these two areas and subjected to radio-elemental concentration analysis by gamma ray spectrometer (GRS) in the laboratory and then dose rates were estimated. Analyses of these three sets of results complement one another, thereby providing a comprehensive picture of the radiation environment over these deposits. The average absorbed area wise dose rate level is estimated to be 130 ± 47 nGy h -1 in Lambapur-Peddagattu, 186 ± 77 nGy h -1 in Chitrial and 63 ± 22 nGy h -1 in Koppunuru. The obtained average dose levels are found to be higher than the world average value of 54 nGy h -1 . The gamma absorbed dose rates in nGy h -1 were converted to annual effective dose rates in mSv y -1 as proposed by the United Nations Scientific Committee on the Effect of Atomic Radiation (UNSCEAR). The annual average effective dose rates for the entire surveyed area is 0.12 mSv y -1 , which is much lower than the recommended limit of 1 mSv y -1 by International Commission on Radiation protection (ICRP). It may be ascertained here that the present study establishes a reference data set (baseline) in these areas
International Nuclear Information System (INIS)
Kocher, D.C.; Eckerman, K.F.
1987-01-01
Dose-rate conversion factors have been calculated for external exposure of the skin from electrons emitted by sources that are deposited uniformly on the body surface. The dose-rate factors are obtained from electron scaled point kernels developed by Berger. The dose-rate factors are calculated at depths of 4, 8, and 40 mg cm-2 below the body surface as recommended by Whitton, and at a depth of 7 mg cm-2 as recommended in ICRP Publication 26 (ICRP77). The dependence of the dose-rate factors at selected depths on the energy of the emitted electrons is displayed. The dose-rate factors for selected radionuclides of potential importance in radiological assessments are tabulated
Smith, R. A.; Moore, R. B.; Shanley, J. B.; Miller, E. K.; Kamman, N. C.; Nacci, D.
2009-12-01
Mercury (Hg) concentrations in fish and aquatic wildlife are complex functions of atmospheric Hg deposition rate, terrestrial and aquatic watershed characteristics that influence Hg methylation and export, and food chain characteristics determining Hg bioaccumulation. Because of the complexity and incomplete understanding of these processes, regional-scale models of fish tissue Hg concentration are necessarily empirical in nature, typically constructed through regression analysis of fish tissue Hg concentration data from many sampling locations on a set of potential explanatory variables. Unless the data sets are unusually long and show clear time trends, the empirical basis for model building must be based solely on spatial correlation. Predictive regional scale models are highly useful for improving understanding of the relevant biogeochemical processes, as well as for practical fish and wildlife management and human health protection. Mechanistically, the logical arrangement of explanatory variables is to multiply each of the individual Hg source terms (e.g. dry, wet, and gaseous deposition rates, and residual watershed Hg) for a given fish sampling location by source-specific terms pertaining to methylation, watershed transport, and biological uptake for that location (e.g. SO4 availability, hill slope, lake size). This mathematical form has the desirable property that predicted tissue concentration will approach zero as all individual source terms approach zero. One complication with this form, however, is that it is inconsistent with the standard linear multiple regression equation in which all terms (including those for sources and physical conditions) are additive. An important practical disadvantage of a model in which the Hg source terms are additive (rather than multiplicative) with their modifying factors is that predicted concentration is not zero when all sources are zero, making it unreliable for predicting the effects of large future reductions in
High-performance supercapacitors using graphene/polyaniline composites deposited on kitchen sponge
International Nuclear Information System (INIS)
Moussa, Mahmoud; Michimore, Andrew; Majeswki, Peter; Ma, Jun; El-Kady, Maher F; Wang, Hao; Xu, Jian; Zhou, Qinqin
2015-01-01
We in this study used a commercial grade kitchen sponge as the scaffold where both graphene platelets (GnPs) and polyaniline (PANi) nanorods were deposited. The high electrical conductivity of GnPs (1460 S cm −1 ) enhances the pseudo-capacitive performance of PANi grown vertically on the GnPs basal planes; the interconnected pores of the sponge provide sufficient inner surface between the GnPs/PANi composite and the electrolyte, which thus facilitates ion diffusion during charge and discharge processes. When the composite electrode was used to build a supercapacitor with two-electrode configuration, it exhibited a specific capacitance of 965.3 F g −1 at a scan rate of 10 mV s −1 in 1.0 M H 2 SO 4 solution. In addition, the composite Nyquist plot showed no semicircle at high frequency corresponding to a low equivalent series resistance of 0.35 Ω. At 100 mV s −1 , the supercapacitor demonstrated an energy density of 34.5 Wh kg −1 and a power density of 12.4 kW kg −1 based on the total mass of the active materials on both electrodes. To demonstrate the performance, we built an array consisting of three cells connected in series, which lit up a red light emitting diode for five minutes. This simple method holds promise for high-performance yet low-cost electrodes for supercapacitors. (paper)
International Nuclear Information System (INIS)
Tian, X.J.; Zhang, S.Q.; Wang, H.M.
2014-01-01
Highlights: • We study the heat treatment parameters of laser deposited near-α titanium alloy. • Microstructure/tensile property relationships are demonstrated and discussed. • Higher cooling rate leads to finer microstructure and higher strength. • Higher anneal temperature promotes strength without ductility obviously decreased. - Abstract: As a metal near-net-shape manufacturing technology, direct laser fabrication has a great potential to reduce costs and delivery time and received an intense attention in the field of titanium alloy aerospace components fabrications. However, the laser deposited titanium alloys usually have equivalent strength and lower ductility compared to the wrought counterparts due to their lamellar microstructure. To investigate the responses of laser deposit titanium alloy Ti–4Al–1.5Mn to anneal parameters, various anneal temperatures and cooling rates were applied in this study. Microstructures were examined by Optical Microscope (OM) and Scanning Electron Microscope (SEM). Microhardness test and room temperature tensile tests were employed to evaluate the tensile properties of the as-deposited and annealed specimens. Results show that air cooling from the α + β phase region generates a microstructure composed of coarse primary α plates and fine lamellar transformed β, while water quenching produces similar but much finer microstructure. Moreover, higher cooling rate generates more area fraction of fine transformed β. With increasing anneal temperature, the ultimate tensile strength and yield strength increase for both cooling methods. Moreover, higher cooling rate leads to higher strength as expected. It is worth noting that both the strength and ductility of the laser deposited alloy improved by water quenched from the α + β duplex phase region. The improved tensile properties were mainly owing to the fine lamellar transformed β in the special bimodal microstructure
Electrochemical behavior of TIO{sub 2} deposited stainless steel in high temperature water
Energy Technology Data Exchange (ETDEWEB)
Okamura, M.; Yamamoto, S. [Toshiba Corp., Kawasaki-city, Kanagawa (Japan); Urata, H.; Takagi, J. [Toshiba Corp., Yokohama-city, Kanagawa (Japan)
2010-07-01
It has previously been confirmed that the electrochemical corrosion potential (ECP) of stainless steel (SS) shifts in the negative direction by deposition of TiO{sub 2}. Recently we showed that TiO{sub 2} could decrease the ECP of SS in the absence of UV irradiation. In this study we measured the anodic polarization curve in high temperature water under UV irradiation and none irradiation condition and considered the mechanism of the ECP shift by TiO{sub 2} deposition. The anodic current density of the specimen increased with increasing the UV irradiation intensity and with increasing the amount of TiO{sub 2} deposition under none UV irradiation. Furthermore the oxide film of the specimen affects on the anodic current density was clarified. It was verified the ECP shift is caused by the anodic current density increasing with TiO{sub 2} deposition under both conditions of UV and none UV irradiation. (author)
Energy Technology Data Exchange (ETDEWEB)
Conlan, D.E.; Longhurst, J.W.S.; Gee, D.R.; Hare, S.E.
1991-07-01
In this document results from the Greater Manchester Acid Deposition Survey (GMADS), an urban precipitation chemistry network, for 1990 are presented. Full analytical methods are described along with the precision and accuracy of the methods used. The spatial variability of precipitation chemistry and deposition over this urban region was investigated using a network of twenty collectors. Concentrations of non marine sulphate, ammonium, calcium and hydrogen, and nitrogen dioxide gas concentrations all show significant spatial variability. The spatial variability of the deposition rates of non marine sulphate, nitrate, ammonium, hydrogen and calcium were significant. (Author).
Reactive physical vapor deposition of TixAlyN: Integrated plasma-surface modeling characterization
International Nuclear Information System (INIS)
Zhang Da; Schaeffer, J.K.
2004-01-01
Reactive physical vapor deposition (RPVD) has been widely applied in the microelectronic industry for producing thin films. Fundamental understanding of RPVD mechanisms is needed for successful process development due to the high sensitivity of film properties on process conditions. An integrated plasma equipment-target nitridation modeling infrastructure for RPVD has therefore been developed to provide mechanistic insights and assist optimal process design. The target nitridation model computes target nitride coverage based on self-consistently derived plasma characteristics from the plasma equipment model; target sputter yields needed in the plasma equipment model are also self-consistently derived taking into account the yield-suppressing effect from nitridation. The integrated modeling infrastructure has been applied to investigating RPVD processing with a Ti 0.8 Al 0.2 compound target and an Ar/N 2 gas supply. It has been found that the process produces athermal metal neutrals as the primary deposition precursor. The metal stoichiometry in the deposited film is close to the target composition due to the predominance of athermal species in the flux that reaches the substrate. Correlations between process parameters (N 2 flow, target power), plasma characteristics, surface conditions, and deposition kinetics have been studied with the model. The deposition process is characterized by two regimes when the N 2 flow rate is varied. When N 2 is dilute relative to argon, target nitride coverage increases rapidly with increasing N 2 flow. The sputter yield and deposition rate consequently decrease. For less dilute N 2 mixtures, the sputter yield and deposition rate are stable due to the saturation of target nitridation. With increasing target power, the electron density increases nearly linearly while the variation of N generation is much smaller. Target nitridation and its suppression of the sputter yield saturate at high N 2 flow rendering these parameters
International Nuclear Information System (INIS)
Milani, P.
2002-01-01
By using a pulsed micro-plasma cluster source and by exploiting aero-dynamical effects typical of supersonic beams it is possible to obtain very high deposition rates with a control on neutral cluster mass distribution, allowing the deposition of thin films with controlled nanostructure. Due to high deposition rates, high lateral resolution, low temperature processing supersonic cluster beams can also be used for the micro and nano-patterning of cluster-assembled films when little or no post-growth manipulation or assembly is required. For example the nano and meso-structure of films obtained by carbon cluster beam deposition can be controlled by selecting in the beam the elemental building blocks, moreover functional properties such as field emission can be controlled and tailored. The use of supersonic cluster beams opens also new perspectives for the production of nano-structured films with novel physico-chemical and topological properties such as nano-structured carbon matrices containing carbide and transition metal particles. (Author)
Method for depositing high-quality microcrystalline semiconductor materials
Guha, Subhendu [Bloomfield Hills, MI; Yang, Chi C [Troy, MI; Yan, Baojie [Rochester Hills, MI
2011-03-08
A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.
Sharma, Shailesh; Gahan, David; Scullin, Paul; Doyle, James; Lennon, Jj; Vijayaraghavan, Rajani K; Daniels, Stephen; Hopkins, M B
2016-04-01
A compact retarding field analyzer with embedded quartz crystal microbalance has been developed to measure deposition rate, ionized flux fraction, and ion energy distribution arriving at the substrate location. The sensor can be placed on grounded, electrically floating, or radio frequency (rf) biased electrodes. A calibration method is presented to compensate for temperature effects in the quartz crystal. The metal deposition rate, metal ionization fraction, and energy distribution of the ions arriving at the substrate location are investigated in an asymmetric bipolar pulsed dc magnetron sputtering reactor under grounded, floating, and rf biased conditions. The diagnostic presented in this research work does not suffer from complications caused by water cooling arrangements to maintain constant temperature and is an attractive technique for characterizing a thin film deposition system.
Energy Technology Data Exchange (ETDEWEB)
Sharma, Shailesh, E-mail: shailesh.sharma6@mail.dcu.ie [Dublin City University, Glasnevin, Dublin 9 (Ireland); Impedans Limited, Chase House, City Junction Business Park, Northern Cross, D17 AK63, Dublin 17 (Ireland); Gahan, David, E-mail: david.gahan@impedans.com; Scullin, Paul; Doyle, James; Lennon, Jj; Hopkins, M. B. [Impedans Limited, Chase House, City Junction Business Park, Northern Cross, D17 AK63, Dublin 17 (Ireland); Vijayaraghavan, Rajani K.; Daniels, Stephen [Dublin City University, Glasnevin, Dublin 9 (Ireland)
2016-04-15
A compact retarding field analyzer with embedded quartz crystal microbalance has been developed to measure deposition rate, ionized flux fraction, and ion energy distribution arriving at the substrate location. The sensor can be placed on grounded, electrically floating, or radio frequency (rf) biased electrodes. A calibration method is presented to compensate for temperature effects in the quartz crystal. The metal deposition rate, metal ionization fraction, and energy distribution of the ions arriving at the substrate location are investigated in an asymmetric bipolar pulsed dc magnetron sputtering reactor under grounded, floating, and rf biased conditions. The diagnostic presented in this research work does not suffer from complications caused by water cooling arrangements to maintain constant temperature and is an attractive technique for characterizing a thin film deposition system.
Dispersion engineering of thick high-Q silicon nitride ring-resonators via atomic layer deposition.
Riemensberger, Johann; Hartinger, Klaus; Herr, Tobias; Brasch, Victor; Holzwarth, Ronald; Kippenberg, Tobias J
2012-12-03
We demonstrate dispersion engineering of integrated silicon nitride based ring resonators through conformal coating with hafnium dioxide deposited on top of the structures via atomic layer deposition. Both, magnitude and bandwidth of anomalous dispersion can be significantly increased. The results are confirmed by high resolution frequency-comb-assisted-diode-laser spectroscopy and are in very good agreement with the simulated modification of the mode spectrum.
Deposition and High-Temperature Corrosion in Biomass-Fired Boilers
DEFF Research Database (Denmark)
Michelsen, Hanne Philbert
with a newly developed condensation probe. SEM analyses revealed that the vapor deposits consisted of individual angular particles of primarily KCl (1-2 µm) and a sponge-like matrix of submicron particles consisting primarily of K2SO4, which may represent vapor condensate agglomerates. Potassium deposits...... deposits at Masnedø CHP. The density and morphology of these layers indicate that they have been molten. This was taken as evidence of a reaction between the deposit and the metal tube.A corrosion mechanism for chlorine corrosion is suggested. The mechanism is based on gaseous chlorine attack where iron...
Directory of Open Access Journals (Sweden)
Suchara Ivan
2015-11-01
Full Text Available Several large-scale and fine-scale biomonitoring surveys were carried out in the Czech Republic to estimate current and long-term accumulated atmospheric deposition rates using moss, spruce bark and forest floor humus as bioindicators since the end of 1980s. The results of the bioindicator analyses significantly correlated with available figures of deposition rates detected at the EMEP or Czech national measurement stations.
Effect of deposition rate on melting point of copper film catalyst substrate at atomic scale
Marimpul, Rinaldo; Syuhada, Ibnu; Rosikhin, Ahmad; Winata, Toto
2018-03-01
Annealing process of copper film catalyst substrate was studied by molcular dynamics simulation. This copper film catalyst substrate was produced using thermal evaporation method. The annealing process was limited in nanosecond order to observe the mechanism at atomic scale. We found that deposition rate parameter affected the melting point of catalyst substrate. The change of crystalline structure of copper atoms was observed before it had been already at melting point. The optimum annealing temperature was obtained to get the highest percentage of fcc structure on copper film catalyst substrate.
Pass-through of Change in Policy Interest Rate to Market Rates
M. Idrees Khawaja; Sajawal Khan
2008-01-01
This paper examines the pass through of the change in policy interest rate of the central bank of Pakistan to market interest rates. The market rates examined include KIBOR, six month deposit rate and weighted average lending rate. More or less complete pass-through of the change in policy rate to KIBOR is observed within one month. However, the magnitude of change in policy rate to deposit and lending rate is not only low but is slow as well. The pass-through to the weighted average lending ...
International Nuclear Information System (INIS)
Moutinho, H.R.; To, B.; Jiang, C.-S.; Xu, Y.; Nelson, B.P.; Teplin, C.W.; Jones, K.M.; Perkins, J.; Al-Jassim, M.M.
2006-01-01
We studied the growth of silicon films deposited by hot-wire chemical vapor deposition under different values of filament current, substrate temperature, and hydrogen dilution ratio. The physical and electrical properties of the films were studied by Raman spectroscopy, x-ray diffraction, atomic force microscopy, conductive-atomic force microscopy, and transmission electron microscopy. There is an interdependence of the growth parameters, and films grown with different parameters can have similar structures. We discuss why this interdependence occurs and how it influences the properties of the deposited films, as well as the deposition rate. In general, the films have a complex structure, with a mixture of amorphous (220)-oriented crystalline and nanocrystalline phases present in most cases. The amount of each phase can be controlled by the variation of one or more of the growth parameters at a time
The effects of atmospheric nitrogen deposition on terrestrial and freshwater biodiversity
Baron, Jill S.; Barber, Mary C.; Adams, Mark; Agboola, Julius I.; Allen, Edith B.; Bealey, William J.; Bobbink, Roland; Bobrovsky, Maxim V.; Bowman, William D.; Branquinho, Cristina; Bustamente, Mercedes M. C.; Clark, Christopher M.; Cocking, Edward C.; Cruz, Cristina; Davidson, Eric A.; Denmead, O. Tom; Dias, Teresa; Dise, Nancy B.; Feest, Alan; Galloway, James N.; Geiser, Linda H.; Gilliam, Frank S.; Harrison, Ian J.; Khanina, Larisa G.; Lu, Xiankai; Manrique, Esteban; Ochoa-Hueso, Raul; Ometto, Jean P. H. B.; Payne, Richard; Scheuschner, Thomas; Sheppard, Lucy J.; Simpson, Gavin L.; Singh, Y. V.; Stevens, Carly J.; Strachan, Ian; Sverdrup, Harald; Tokuchi, Naoko; van Dobben, Hans; Woodin, Sarah
2014-01-01
This chapter reports the findings of a Working Group on how atmospheric nitrogen (N) deposition affects both terrestrial and freshwater biodiversity. Regional and global scale impacts on biodiversity are addressed, together with potential indicators. Key conclusions are that: the rates of loss in biodiversity are greatest at the lowest and initial stages of N deposition increase; changes in species compositions are related to the relative amounts of N, carbon (C) and phosphorus (P) in the plant soil system; enhanced N inputs have implications for C cycling; N deposition is known to be having adverse effects on European and North American vegetation composition; very little is known about tropical ecosystem responses, while tropical ecosystems are major biodiversity hotspots and are increasingly recipients of very high N deposition rates; N deposition alters forest fungi and mycorrhyzal relations with plants; the rapid response of forest fungi and arthropods makes them good indicators of change; predictive tools (models) that address ecosystem scale processes are necessary to address complex drivers and responses, including the integration of N deposition, climate change and land use effects; criteria can be identified for projecting sensitivity of terrestrial and aquatic ecosystems to N deposition. Future research and policy-relevant recommendations are identified.
Nickel coating on high strength low alloy steel by pulse current deposition
Nigam, S.; Patel, S. K.; Mahapatra, S. S.; Sharma, N.; Ghosh, K. S.
2015-02-01
Nickel is a silvery-white metal mostly used to enhance the value, utility, and lifespan of industrial equipment and components by protecting them from corrosion. Nickel is commonly used in the chemical and food processing industries to prevent iron from contamination. Since the properties of nickel can be controlled and varied over broad ranges, nickel plating finds numerous applications in industries. In the present investigation, pulse current electro-deposition technique has been used to deposit nickel on a high strength low alloy (HSLA) steel substrate.Coating of nickel is confirmed by X-ray diffraction (XRD) and EDAX analysis. Optical microscopy and SEM is used to assess the coating characteristics. Electrochemical polarization study has been carried out to study the corrosion behaviour of nickel coating and the polarisation curves have revealed that current density used during pulse electro-deposition plays a vital role on characteristics of nickel coating.
DEFF Research Database (Denmark)
Jensen, Jens Arne Dahl; Møller, Per; Bruton, Tim
2003-01-01
This article reports on a newly developed method for electrochemical deposition of buried Cu contacts in Si-based photovoltaic ~PV! cells. Contact grooves, 20 mm wide by 40 mm deep, were laser-cut into Si PV cells, hereafter applied with a thin electroless NiP base and subsequently filled with Cu...... by electrochemical deposition at a rate of up to 10 mm per min. With the newly developed process, void-free, superconformal Cu-filling of the laser-cut grooves was observed by scanning electron microscopy and focused ion beam techniques. The Cu microstructure in grooves showed both bottom and sidewall texture......, with a grain-size decreasing from the center to the edges of the buried Cu contacts and a pronounced lateral growth outside the laser-cut grooves. The measured specific contact resistances of the buried contacts was better than the production standard. Overall performance of the new PV cells was equal...
Dinis, Pedro A.; Pereira, Alcides C.; Quinzeca, Domingos; Jombi, Domingos
2017-10-01
A strandplain at the downdrift side of the wave-dominated Catumbela delta (Angola) includes distinguishable deposits with very high natural radioactivity (up to 0.44 microSv/hour). In order to establish the geometry of these sedimentary units and understand their genetic processes, dose rate surveys were performed with the portable equipment Rados RDS-40WE. In addition, grain-size distribution, heavy-mineral composition and gamma-ray mass spectra of the high dose rate deposits were analysed. High dose rate values are found in ribbon units aligned parallel to the shoreline, which are a few tens of meters wide and up to approximately 3 km long. These units reflect the concentration of Th-bearing grains in coastal deposits enriched in heavy minerals. An integrated analysis of the high dose rate ribbons in GIS environment with aerial photography and topographic maps suggests that parts of the high dose rate units formed during the last two centuries may be related with the erosion of older shoreline deposits, due to updrift displacements of the Catumbela river outlet and recycling of shoreline accumulations with downdrift deposition. Simple gamma-ray surveys carried out with a portable detector can unravel depositional units characterised by significant enrichment in heavy-mineral grains that are likely to correspond to key events in the evolution of wave-dominated accumulations. The location of such deposits should be taken into account when planning future work using more expensive or time-consuming techniques.
Inhalation of nanoplatelets - Theoretical deposition simulations.
Sturm, Robert
2017-12-01
Primary objective of the contribution was the theoretical prediction of nanoplatelet deposition in the human respiratory tract. Modeling was founded on the hypothetical inhalation of graphene nanoplatelets (GNP) measuring 0.01 and 0.1μm in thickness and adopting a projected area diameter of 1-30μm. Particle uptake was assumed to take place with inhalation flow rates of 250, 500, 750, and 1000cm 3 s -1 , respectively. For an appropriate description of pulmonary particle behavior, transport of GNP in a stochastic lung structure and deposition formulae based on analytical and numerical studies were presupposed. The results obtained from the theoretical approach clearly demonstrate that GNP with a thickness of 0.01μm deposit in the respiratory tract by 20-50%, whereas GNP with a thickness of 0.1μm exhibit a deposition of 20-90%. Larger platelets deposit with higher probability than small ones. Increase of inhalation flow rate is accompanied by decreased deposition in the case of thin GNP, whilst thicker GNP are preferably accumulated in the extrathoracic region. Generation-specific deposition ranges from 0.05 to 7% (0.01μm) and from 0.05 to 9%, with maximum values being obtained in airway generation 20. In proximal airway generations (0-10), deposition is increased with inhalation flow rate, whereas in intermediate to distal generations a reverse effect may be observed. Health consequences of GNP deposition in different lung compartments are subjected to an intense debate. Copyright © 2017. Published by Elsevier GmbH.
Control of hydrocarbon radicals and film deposition by using an RF Whistler wave discharge
International Nuclear Information System (INIS)
Mieno, Tetsu; Shoji, Tatsuo; Kadota, Kiyoshi.
1991-10-01
Production of hydrocarbon radicals is controlled by using an RF Whistler wave discharge in a low pressure region (∼0.1 Pa). Plasma density of 10 10 - 10 13 cm -3 , electron temperature of 2-20 eV is obtained for the discharge of admixture of Ar and small content of source gases (CH 4 , C 2 H 2 , CO). Spectroscopic measurement indicates that densities of CH and H radicals and deposition rate of amorphous carbon:H film increase with electron density, electron temperature and source gas pressure. The etching effect of H atoms influences on the deposition rate and a high deposition rate (90 μm/hr for CO/Ar discharge) is obtained even in a low neutral pressure discharge. (author)
International Nuclear Information System (INIS)
Cheng Wei; Miao Aisheng; Li Jianhua; Zhou Lei; Chang Jingtao
2014-01-01
In-situ Leaching adaptability of a ground water oxidation zone type sandstone uranium deposit from Inner Mongolia is studied. The ore of the uranium deposit has high acid consumption and sensitivities in in-situ leaching. The leaching process with agent of CO_2 + O_2 and adjusting concentration of HCO_3"- can be suitable for the deposit. (authors)
Investigation into Generation of Micro Features by Localised Electrochemical Deposition
Debnath, Subhrajit; Laskar, Hanimur Rahaman; Bhattacharyya, B.
2017-11-01
With the fast advancement of technology, localised electrochemical deposition (LECD) is becoming very advantageous in generating high aspect ratio micro features to meet the steep demand in modern precision industries of the present world. Except many other advantages, this technology is highly uncomplicated and economical for fabricating metal micro-parts with in micron ranges. In the present study, copper micro-columns have been fabricated utilizing LECD process. Different process parameters such as voltage, frequency, duty ratio and electrolyte concentration, which affect the deposition performance have been identified and their effects on deposition performances such as deposition rate, height and diameter of the micro-columns have been experimentally investigated. Taguchi's methodology has been used to study the effects as well as to obtain the optimum values of process parameters so that localised deposition with best performance can be achieved. Moreover, the generated micro-columns were carefully observed under optical and scanning electron microscope from where the surface quality of the deposited micro-columns has been studied qualitatively. Also, an array of copper micro-columns has been fabricated on stainless steel (SS-304) substrate for further exploration of LECD process capability.
Impurities in chromium deposits produced by electroplating and physical vapor deposition
Energy Technology Data Exchange (ETDEWEB)
Dini, J.W.
1994-05-01
Impurity contents in electrodeposited (hexavalent and trivalent) chromium deposits and physically vapor deposited (thermal evaporation, electron beam evaporation and rf-sputtering) were compared. Oxygen is the key impurity obtained in electrodeposited films but it can be minimized in hexavalent plating solutions by operating at high temperature, e. g., 85 C. Electrodeposits produced in trivalent chromium plating solutions and physically vapor deposited films have much higher oxygen contents than electrodeposits produced in hexavalent chromium solutions operated at temperatures around 85 C. Depending on the target material used for physically vapor deposited films, these films can also have high amounts of other impurities.
International Nuclear Information System (INIS)
Nakabayashi, Daizo; Sawai, Kenji; Saito, Shigeki; Takahashi, Kunio
2012-01-01
Recently, micromanipulation techniques have been in high demand. A technique to deposit a metal microparticle onto a metal substrate by using a single metal probe has been proposed as one of the techniques. A solder particle with a diameter of 20–30 µm, initially adhering to the probe tip, is detached and deposited onto a substrate. The success rate of the particle deposition was 44% in the previous research, and is insufficient for industrial applications. In this paper, a technique of particle deposition by applying a single rectangular pulse is proposed, and the mechanism of the deposition is described. In the mechanism, an electric discharge between the probe and the particle when the particle reaches the substrate plays an important role in the particle deposition. Moreover, the mechanism of the proposed technique is verified by experiments of particle deposition, which are observed using a high-speed camera, a scanning electron microscope (SEM) and an oscilloscope. The success rate of the particle deposition has increased to 93% by the proposed technique. Furthermore, the damage to the particle by the electric discharge is evaluated using an RC circuit model, and the applicability of the proposed technique is discussed. (paper)
Effects of deposition conditions on the properties of pyrolytic carbon deposited in a fluidized bed
International Nuclear Information System (INIS)
Lowden, Richard Andrew; Hunn, John D.; Nunn, Stephen D.; Kercher, Andrew K.; Price, Jeffery R.; Jellison, Gerald Earle Jr.
2005-01-01
The high-density, isotropic pyrolytic carbon layer beneath the silicon carbide (IPyC) plays a key role in the irradiation performance of coated particle fuel. The IPyC layer protects the kernel from reactions with chlorine during deposition of the SiC layer, provides structural support for the SiC layer, and protects the SiC from fission products and carbon monoxide. The process conditions used by the Germans to deposit the IPyC coating produced a highly isotropic, but somewhat permeable IPyC coating. The permeability of the IPyC coating was acceptable for use with the dense German UO 2 kernels, but may not be suitable when coating UCO kernels. The UCO kernels are typically more porous and thus have a larger surface area than UO 2 kernels. The lower density and the higher surface area of UCO kernels could make them more susceptible to attack by HCl gas during the silicon carbide (SiC) coating process, which could result in heavy metal dispersion into the buffer and IPyC coatings and a higher level of as-manufactured SiC defects. The relationship between IPyC deposition conditions, permeability, and anisotropy must be understood and the appropriate combination of anisotropy and permeability for particle fuel containing UCO kernels selected. A reference set of processing conditions have been determined from review of historical information and results of earlier coating experiments employing 350 and 500 (micro)m UO 2 kernels. It was decided that a limited study would be conducted, in which only coating gas fraction (CGF) and temperature would be varied. Coatings would be deposited at different rates and with a range of microstructures. Thickness, density, porosity and anisotropy would be measured and permeability evaluated using a chlorine leach test. The results would be used to select the best IPyC coating conditions for use with the available natural enrichment uranium carbide/uranium oxide (NUCO) kernels. The response plots from the investigation of the
Laser chemical vapor deposition of millimeter scale three-dimensional shapes
Shaarawi, Mohammed Saad
2001-07-01
Laser chemical vapor deposition (LCVD) has been successfully developed as a technique to synthesize millimeter-scale components directly from the gas phase. Material deposition occurs when heat generated by the interaction of a laser beam with a substrate thermally decomposes the gas precursor. Selective illumination or scanning the laser beam over portions of a substrate forms the single thin layer of material that is the building block of this process. Sequential scanning of the laser in a pre-defined pattern on the substrate and subsequent deposit causes the layers to accumulate forming the three-dimensional shape. The primary challenge encountered in LCVD shape forming is the synthesis of uniform layers. Three deposition techniques are studied to address this problem. The most successful technique, Active Surface Deposition, is based on the premise that the most uniform deposits are created by measuring the deposition surface topology and actively varying the deposition rate in response to features at the deposition surface. Defects observed in the other techniques were significantly reduced or completely eliminated using Active Surface Deposition. The second technique, Constant Temperature Deposition, maintains deposit uniformity through the use of closed-loop modulation of the laser power to sustain a constant surface temperature during deposition. The technique was successful in depositing high quality graphite tubes >2 mm tall from an acetylene precursor and partially successful in depositing SiC + C composite tubes from tetramethylsilane (TMS). The final technique, Constant Power Deposition, is based on the premise that maintaining a uniform power output throughout deposition would result in the formation of uniform layers. Constant Power Deposition failed to form coherent shapes. Additionally, LCVD is studied using a combination of analytic and numerical models to gain insight into the deposition process. Thermodynamic modeling is used to predict the
Mining the high grade McArthur River uranium deposit
International Nuclear Information System (INIS)
Jamieson, B.W.
2002-01-01
The McArthur River deposit, discovered in 1988, is recognized as the world's largest, highest grade uranium deposit, with current mineable reserves containing 255 million lb U 3 O 8 at an average grade of 17.33% U 3 O 8 . In addition the project has resources of 228 million pounds U 3 O 8 averaging 12.02% U 3 O 8 . Mining this high-grade ore body presents serious challenges in controlling radiation and in dealing with high water pressures. Experience from the underground exploration programme has provided the information needed to plan the safe mining of the massive Pelite ore zone, which represents the most significant source of ore discovered during the underground drilling programme, with 220 million pounds of U 3 O 8 at an average grade in excess of 17%. Non-entry mining will be used in the high-grade ore zones. Raise boring will be the primary method to safely extract the ore, with all underground development in waste rock to provide radiation shielding. Water will be controlled by grouting and perimeter freezing. The ore cuttings from the raise boring will be ground underground and pumped to surface as slurry, at an average daily production of 150 tonnes. The slurry will be transported to the Key Lake mill and diluted to 4% before processing. The annual production is projected to be 18 million lb U 3 O 8 . The paper focuses on the activities undertaken since discovery, including the initiation of the raise bore mining method utilized to safely mine this high grade ore body. Radiation protection, environmental protection and worker health and safety are discussed in terms of both design and practical implementation. (author)
Salt Separation from Uranium Deposits in Integrated Crucible
Energy Technology Data Exchange (ETDEWEB)
Kwon, S. W.; Park, K. M.; Chang, J. H.; Kim, J. G.; Park, S. B. [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)
2014-05-15
The solid cathode processing is necessary to separate the salt from the cathode since the uranium deposit in a solid cathode contains electrolyte salt. A physical separation process, such as distillation separation, is more attractive than a chemical or dissolution process because physical processes generate much less secondary process. Distillation process was employed for the cathode processsing due to the advantages of minimal generation of secondary waste, compact unit process, simple and low cost equipment. The basis for vacuum distillation separation is the difference in vapor pressures between salt and uranium. A solid cathode deposit is heated in a heating region and salt vaporizes, while non-volatile uranium remains behind. It is very important to increase the throughput of the salt separation system due to the high uranium content of spent nuclear fuel and high salt fraction of uranium dendrites. The evaporation rate of the LiCl-KCl eutectic salt in vacuum distiller is not so high to come up with the generation capacity of uranium dendrites in electro-refiner. Therefore, wide evaporation area or high distillation temperature is necessary for the successful salt separation. The adhered salt in the uranium deposits was removed successfully. The salt content in the deposits was below 0.1 wt% after the sequential operation of the liquid salt separation - salt distillation.
International Nuclear Information System (INIS)
Coppe, Jean-Philippe; Xu Zhida; Chen Yi; Logan Liu, G
2011-01-01
Molecular probe arrays printed on solid surfaces such as DNA, peptide, and protein microarrays are widely used in chemical and biomedical applications especially genomic and proteomic studies (Pollack et al 1999 Nat. Genet. 23 41-6, Houseman et al 2002 Nat. Biotechnol. 20 270-4, Sauer et al 2005 Nat. Rev. Genet. 6 465-76) as well as surface imaging and spectroscopy (Mori et al 2008 Anal. Biochem. 375 223-31, Liu et al 2006 Nat. Nanotechnol. 1 47-52, Liu 2010 IEEE J. Sel. Top. Quantum Electron. 16 662-71). Unfortunately the printed molecular spots on solid surfaces often suffer low distribution uniformity due to the lingering 'coffee stain' (Deegan et al 1997 Nature 389 827-9) problem of molecular accumulations and blotches, especially around the edge of deposition spots caused by solvent evaporation and convection processes. Here we present, without any surface chemistry modification, a unique solid surface of high-aspect-ratio silver-coated silicon nanocone arrays that allows highly uniform molecular deposition and thus subsequent uniform optical imaging and spectroscopic molecular detection. Both fluorescent Rhodamine dye molecules and unlabeled oligopeptides are printed on the metallic nanocone photonic substrate surface as circular spot arrays. In comparison with the printed results on ordinary glass slides and silver-coated glass slides, not only high printing density but uniform molecular distribution in every deposited spot is achieved. The high-uniformity and repeatability of molecular depositions on the 'coffee stain'-free nanocone surface is confirmed by laser scanning fluorescence imaging and surface enhanced Raman imaging experiments. The physical mechanism for the uniform molecular deposition is attributed to the superhydrophobicity and localized pinned liquid-solid-air interface on the silver-coated silicon nanocone surface. The unique surface properties of the presented nanocone surface enabled high-density, high-uniformity probe spotting beneficial
Nitrogen retention in contrasting temperate forests exposed to high nitrogen deposition
Staelens, J.; Adriaenssens, S.; Wuyts, K.; Verheyen, K.; Boeckx, P. F.
2011-12-01
A better understanding of factors affecting nitrogen (N) retention is needed to assess the impact of changing anthropogenic N emissions and climatic conditions on N cycling and N loss by terrestrial ecosystems. Retention of N has been demonstrated for a wide range of forests, including ecosystems exposed to chronically enhanced N deposition, but it is still unclear which factors determine this N retention capacity. Therefore, we examined the possible effects of forest type on N retention using stable N isotopes. The study was carried out in adjacent equal-aged deciduous (pedunculate oak (Quercus robur L.)) and coniferous (Scots pine (Pinus sylvestris L.)) stands with a similar stand history and growing on a well-drained sandy soil in a region with enhanced N deposition (Belgium). The N input-output budgets and gross soil N transformation rates differed significantly between the two stands. The forest floor was exposed to a high inorganic N input from atmospheric deposition, which was nearly twice as high in the pine stand (33 ± 2 kg N ha-1 yr-1; mean ± standard error) as in the oak stand (18 ± 1 kg N ha-1 yr-1). The N input was reflected in the soil solution under the rooting zone, but the mean nitrate concentration was eight times higher under pine (19 ± 5 mg N L-1) than under oak (2.3 ± 0.9 mg N L-1). Gross N dynamics in the mineral topsoil were determined by in situ 15N labelling of undisturbed soil cores combined with numerical data analysis. Gross N mineralization was two times faster in the oak soil while nitrate production was two times faster in the pine soil, indicating a dominant effect of vegetation cover on soil N cycling. The higher gross nitrification, particularly due to oxidation of organic N, in the pine soil compared to the oak soil, combined with negligible nitrate immobilization, was in line with the higher nitrate leaching under the pine forest. On a larger spatial and temporal scale, the fate of dissolved inorganic N within these forests
Hot wire deposited hydrogenated amorphous silicon solar cells
Energy Technology Data Exchange (ETDEWEB)
Mahan, A.H.; Iwaniczko, E.; Nelson, B.P.; Reedy, R.C. Jr.; Crandall, R.S. [National Renewable Energy Lab., Golden, CO (United States)
1996-05-01
This paper details the results of a study in which low H content, high deposition rate hot wire (HW) deposited amorphous silicon (a-Si:H) has been incorporated into a substrate solar cell. The authors find that the treatment of the top surface of the HW i layer while it is being cooled from its high deposition temperature is crucial to device performance. They present data concerning these surface treatments, and correlate these treatments with Schottky device performance. The authors also present first generation HW n-i-p solar cell efficiency data, where a glow discharge (GD) {mu}c-Si(p) layer was added to complete the partial devices. No light trapping layer was used to increase the device Jsc. Their preliminary investigations have yielded efficiencies of up to 6.8% for a cell with a 4000 {Angstrom} thick HW i-layer, which degrade less than 10% after a 900 hour light soak. The authors suggest avenues for further improvement of their devices.
CSIR Research Space (South Africa)
Mahamood, RM
2013-03-01
Full Text Available The most commonly used aerospace titanium alloy, Ti6Al4V, was deposited on Ti6Al4V plate of dimension 72 x 72 x5mm. The laser power of 3 kW, powder flow rate of 1.44 g/min and gas flow rate of 4 l/min were used throughout the deposition process...
High nitrogen deposition in an agricultural ecosystem of Shaanxi, China.
Liang, Ting; Tong, Yan'an; Liu, Xuejun; Xu, Wen; Luo, Xiaosheng; Christie, Peter
2016-07-01
Atmospheric nitrogen (N) deposition plays an important role in the global N cycle. Data for dry and wet N deposition in agricultural ecosystem of Shaanxi in China is still imperfect; in this study, we continuously measured concentrations and fluxes of dry N deposition from 2010 to 2013 in Yangling district of Shaanxi province and wet N deposition from 2010 to 2012. The average annual concentrations of NH3, NO2, HNO3, particulate ammonium, and nitrate (pNH4 (+) and pNO3 (-)) varied among 3.9-9.1, 6.6-8.0, 1.2-1.4, 3.1-4.3, and 3.3-4.8 μg N m(-3), respectively, with mean values of 6.0, 7.2, 1.3, 3.8, and 4.1 μg N m(-3), respectively, during the entire monitoring period. The annual NH4 (+)-N and NO3 (-)-N concentrations in precipitation ranged 3.9-4.3 and 2.8-3.4 mg N L(-1) with the mean values of 4.1 and 3.3 mg N L(-1). The NH4 (+)-N/NO3 (-)-N ratio in rainfall averaged 1.2. Dry N deposition flux was determined to be 19.2 kg N ha(-1) year(-1) and the wet N deposition flux was 27.2 kg N ha(-1) year(-1). The amount of total atmospheric N deposition (dry plus wet) reached 46.4 kg N ha(-1) year(-1), in which dry deposition accounted 41 %. Gaseous N deposition comprised over 75 % of the dry deposition, and the proportion of oxidized N in dry deposition was equal to the reduced N. Therefore, the results suggest that more stringent regional air pollution control policies are required in the target area and that N deposition is an important nutrient resource from the atmosphere that must be taken into consideration in nutrient management planning of agricultural ecosystems.
ITO thin films deposited by advanced pulsed laser deposition
International Nuclear Information System (INIS)
Viespe, Cristian; Nicolae, Ionut; Sima, Cornelia; Grigoriu, Constantin; Medianu, Rares
2007-01-01
Indium tin oxide thin films were deposited by computer assisted advanced PLD method in order to obtain transparent, conductive and homogeneous films on a large area. The films were deposited on glass substrates. We studied the influence of the temperature (room temperature (RT)-180 deg. C), pressure (1-6 x 10 -2 Torr), laser fluence (1-4 J/cm 2 ) and wavelength (266-355 nm) on the film properties. The deposition rate, roughness, film structure, optical transmission, electrical conductivity measurements were done. We deposited uniform ITO thin films (thickness 100-600 nm, roughness 5-10 nm) between RT and 180 deg. C on a large area (5 x 5 cm 2 ). The films have electrical resistivity of 8 x 10 -4 Ω cm at RT, 5 x 10 -4 Ω cm at 180 deg. C and an optical transmission in the visible range, around 89%
Partridge, J. G.; Mayes, E. L. H.; McDougall, N. L.; Bilek, M. M. M.; McCulloch, D. G.
2013-04-01
ZnO films have been reactively deposited on sapphire substrates at 300 °C using a high impulse power magnetron sputtering deposition system and characterized structurally, optically and electronically. The unintentionally doped n-type ZnO films exhibit high transparency, moderate carrier concentration (˜5 × 1018 cm-3) and a Hall mobility of 8.0 cm2 V-1 s-1, making them suitable for electronic device applications. Pt/ZnO Schottky diodes formed on the HiPIMS deposited ZnO exhibited rectification ratios up to 104 at ±2 V and sensitivity to UV light.
Gaseous material capacity of open plasma jet in plasma spray-physical vapor deposition process
Liu, Mei-Jun; Zhang, Meng; Zhang, Qiang; Yang, Guan-Jun; Li, Cheng-Xin; Li, Chang-Jiu
2018-01-01
Plasma spray-physical vapor deposition (PS-PVD) process, emerging as a highly efficient hybrid approach, is based on two powerful technologies of both plasma spray and physical vapor deposition. The maximum production rate is affected by the material feed rate apparently, but it is determined by the material vapor capacity of transporting plasma actually and essentially. In order to realize high production rate, the gaseous material capacity of plasma jet must be fundamentally understood. In this study, the thermal characteristics of plasma were measured by optical emission spectrometry. The results show that the open plasma jet is in the local thermal equilibrium due to a typical electron number density from 2.1 × 1015 to 3.1 × 1015 cm-3. In this condition, the temperature of gaseous zirconia can be equal to the plasma temperature. A model was developed to obtain the vapor pressure of gaseous ZrO2 molecules as a two dimensional map of jet axis and radial position corresponding to different average plasma temperatures. The overall gaseous material capacity of open plasma jet, take zirconia for example, was further established. This approach on evaluating material capacity in plasma jet would shed light on the process optimization towards both depositing columnar coating and a high production rate of PS-PVD.
Deposition and characterisation of copper for high density interconnects
International Nuclear Information System (INIS)
McCusker, N.
1999-09-01
Copper has been deposited by sputtering and investigated for application as high density interconnects, with a view to maximising its performance and reliability. A sputter deposition process using gettering has been developed, which produces consistently pure, low resistivity films. A relationship between film thickness and resistivity has been explained by studying the grain growth process in copper films using atomic force microscopy. The Maydas-Shatzkes model has been used to separate the contributions of grain boundary and surface scattering to thin film resistivity, in copper and gold. Stress and texture in copper film have been studied. Annealing has been used to promote grain growth and texture development. Electromigration has been studied in copper and aluminium interconnects using a multi-line accelerated test set-up. A difference in failure distributions and void morphologies has been explained by an entirely different damage mechanism. The importance of surface/interface migration in electromigration damage of copper lines has been established and explained using a grain boundary-grooving model. A tantalum overlayer was found to extend the lifetime of copper lines. A composite sputtering target has been used to deposit copper/zirconium alloy films. The composition of the alloys was studied by Rutherford backscattering, Auger and secondary neutral mass spectrometry. The alloy films had an improved electromigration lifetime. A surface controlled mechanism is proposed to explain the advantage. A metal oxide semiconductor (MOS) capacitor technique is used to investigate barrier reliability. Tungsten is shown to be an effective diffusion barrier for copper, up to 700 deg. C. (author)
Hydrogen-permeable TiO{sub 2}/SiO{sub 2} membranes formed by chemical vapor deposition
Energy Technology Data Exchange (ETDEWEB)
Ha, Heung Yong; Nam, Suk Woo; Yoon, Sung Pil [Korea Institute of Science and Technology, Seoul (Korea, Republic of)] [and others
1994-12-31
Thin films of TiO{sub 2}/SiO{sub 2} were deposited on the inner surface of the porous support tubes by the decomposition of tetraisopropyl titanate (TIPT) and tetraethyl orthosilicate (TEOS) at atmospheric pressure. Dense and hydrogen-permeable membranes were formed at 400-600{degrees}C. The permeation rate of H{sub 2} through the membrane at 600{degrees}C was about 0.3 cm{sup 3}(STP)/min-cm{sup 2}-atm and H{sub 2}/N{sub 2} permeation ratio was above 1000. The permeation properties of the membranes were investigated at various deposition temperatures and TIPT/TEOS concentrations. Decomposition of TIPT alone at temperatures above 400{degrees}C produced porous crystalline TiO{sub 2} films which were not H{sub 2}-selective. Decomposition of TEOS, however produced H{sub 2}-permeable SiO{sub 2} films at 400-600{degrees}C but film deposition rate was very low. Addition of TIPT to the TEOS stream significantly accelerated the deposition rate and produced highly H{sub 2}-selective films. Increasing the TEPT/TEOS ratios increased the deposition rate. The TiO{sub 2}/SiO{sub 2} membranes have the permeation properties comparable to those of SiO{sub 2} membranes. The TiO{sub 2}/SiO{sub 2} membranes were stable and did not show significant densification during the treatment at high temperature.
Pulsed laser deposition in Twente: from research tool towards industrial deposition
Blank, David H.A.; Dekkers, Jan M.; Rijnders, Augustinus J.H.M.
2014-01-01
After the discovery of the perovskite high Tc superconductors in 1986, a rare and almost unknown deposition technique attracted attention. Pulsed laser deposition (PLD), or laser ablation as it was called in the beginning, became popular because of the possibility to deposit complex materials, like
Chen, S. T.; Chen, W. S.
2016-12-01
Holocene marine deposits rest above the fluvial deposits. The crustal high uplift rates of relative sea-level changes led to form a well-developed multiple Holocene marine terraces.
Qaisi, Ramy M.; Smith, Casey; Hussain, Muhammad Mustafa
2014-01-01
We report the characteristics of atmospheric chemical vapor deposition grown bilayer graphene transistors fabricated on ultra-scaled (10 nm) high-κ dielectric aluminum oxide (Al2O3) at elevated temperatures. We observed that the drive current increased by >400% as temperature increased from room temperature to 250 °C. Low gate leakage was maintained for prolonged exposure at 100 °C but increased significantly at temperatures >200 °C. These results provide important insights for considering chemical vapor deposition graphene on aluminum oxide for high temperature applications where low power and high frequency operation are required. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Qaisi, Ramy M.
2014-05-15
We report the characteristics of atmospheric chemical vapor deposition grown bilayer graphene transistors fabricated on ultra-scaled (10 nm) high-κ dielectric aluminum oxide (Al2O3) at elevated temperatures. We observed that the drive current increased by >400% as temperature increased from room temperature to 250 °C. Low gate leakage was maintained for prolonged exposure at 100 °C but increased significantly at temperatures >200 °C. These results provide important insights for considering chemical vapor deposition graphene on aluminum oxide for high temperature applications where low power and high frequency operation are required. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Development of Real-Time Measurement of Effective Dose for High Dose Rate Neutron Fields
Braby, L A; Reece, W D
2003-01-01
Studies of the effects of low doses of ionizing radiation require sources of radiation which are well characterized in terms of the dose and the quality of the radiation. One of the best measures of the quality of neutron irradiation is the dose mean lineal energy. At very low dose rates this can be determined by measuring individual energy deposition events, and calculating the dose mean of the event size. However, at the dose rates that are normally required for biology experiments, the individual events can not be separated by radiation detectors. However, the total energy deposited in a specified time interval can be measured. This total energy has a random variation which depends on the size of the individual events, so the dose mean lineal energy can be calculated from the variance of repeated measurements of the energy deposited in a fixed time. We have developed a specialized charge integration circuit for the measurement of the charge produced in a small ion chamber in typical neutron irradiation exp...
Some Causative Factors in Bank Deposit Supply Model in Nigeria: A ...
African Journals Online (AJOL)
In this study, we examined some of the factors that influence the commercial bank deposit supply behaviour in Nigeria. Specifically, we examined the impact of deposit interest rate, foreign exchange rate, Treasury bill rate and Growth rate of Gross Domestic Product on the deposit output behaviour of commercial banks.
International Nuclear Information System (INIS)
Bagcivan, N.; Bobzin, K.; Ludwig, A.; Grochla, D.; Brugnara, R.H.
2014-01-01
stress was determined via Si microcantilever curvature measurements. The phase analysis revealed the formation of h-Cr 2 N, c-CrN and c-AlN mixed phases for the mfMS CrN/AlN coatings, whereas the HPPMS coatings exhibited only cubic phases (c-CrN, c-AlN). A hardness of 31.0 GPa was measured for the HPPMS coating with a bilayer period of 6.2 nm. The decrease of the HPPMS pulse length at constant mean power leads to a considerable increase of the cathode current on the Cr and Al target associated with an increased ion flux towards the substrate. Furthermore, it was observed that the deposition rate of HPPMS CrN/AlN decreases with shorter pulse lengths, so that a CrN/AlN coating with a bilayer period of 2.9 nm, a high hardness of 40.8 GPa and a high compressive stress (− 4.37 GPa) was achieved using a short pulse length of 40 μs. - Highlights: • HPPMS and mfMS CrN/AlN nanolaminate coatings were investigated. • HPPMS CrN/AlN coatings were deposited at various pulse lengths. • Decreasing of the HPPMS pulse length leads to a reduction of bilayer period. • HPPMS CrN/AlN coating deposited at short pulse showed a super hardness of 40.8 GPa. • Short HPPMS pulse and high peak current lead to high coating compressive stress
Response of Sphagnum mosses to increased CO{sub 2} concentration and nitrogen deposition
Energy Technology Data Exchange (ETDEWEB)
Jauhiainen, J.
1998-12-31
The main objective of this work was to study the effects of different CO{sub 2} concentration and N deposition rates on Sphagna adapted to grow along a nutrient availability gradient (i.e. ombrotrophy-mesotrophy-eutrophy). The study investigated: (i) the effects of various longterm CO{sub 2} concentrations on the rate of net photosynthesis in Sphagna, (ii) the effects of the CO{sub 2} and N treatments on the moss density, shoot dry masses, length increment and dry mass production in Sphagna, (iii) the concentrations of the major nutrients in Sphagna after prolonged exposure to the CO{sub 2} and N treatments, and (iv) species dependent differences in potential NH{sub 4}{sup +} and NO{sub 3}{sup -} uptake rates. The internal nutrient concentration of the capitulum and the production of biomass were effected less by the elevated CO{sub 2} concentrations because the availability of N was a controlling factor. In addition responses to the N treatments were related to ecological differences between the Sphagna species. Species with a high tolerance of N availability were able to acclimatise to the increased N deposition rates. The data suggests a high nutrient status is less significant than the adaptation of the Sphagna to their ecological niche (e.g. low tolerance of meso-eutrophic S. warnstorfii to high N deposition rate). At the highest N deposition rate the ombrotrophic S. fuscum had the highest increase in tissue N concentration among the Sphagna studied. S. fuscum almost died at the highest N deposition rate because of the damaging effects of N to the plant`s metabolism. Ombrotrophic hummock species such as S. fuscum, were also found to have the highest potential N uptake rate (on density of dry mass basis) compared to lawn species. The rate of net photosynthesis was initially increased with elevated CO{sub 2} concentrations, but photosynthesis was down regulated with prolonged exposure to CO{sub 2}. The water use efficiency in Sphagna appeared not to be coupled
Highly conducting and transparent Ti-doped CdO films by pulsed laser deposition
International Nuclear Information System (INIS)
Gupta, R.K.; Ghosh, K.; Patel, R.; Kahol, P.K.
2009-01-01
Titanium-doped cadmium oxide thin films were deposited on quartz substrate by pulsed laser deposition technique. The effect of substrate temperature on structural, optical and electrical properties was studied. The films grown at high temperature show (2 0 0) preferred orientation, while films grown at low temperature have both (1 1 1) and (2 0 0) orientation. These films are highly transparent (63-79%) in visible region, and transmittance of the films depends on growth temperature. The band gap of the films varies from 2.70 eV to 2.84 eV for various temperatures. It is observed that resistivity increases with growth temperature after attaining minimum at 150 deg. C, while carrier concentration continuously decreases with temperature. The low resistivity, high transmittance and wide band gap titanium-doped CdO films could be an excellent candidate for future optoelectronic and photovoltaic applications.
Analysing the Cenozoic depositional record
DEFF Research Database (Denmark)
Goledowski, Bartosz; Clausen, O.R.; Nielsen, S.B.
2008-01-01
It is well known that sediment deposition in the North Sea and on the Norwegian Shelf varied significantly during the Cenozoic as a consequence of varying erosion rate mainly in Western Scandinavia, in Scotland and in the Alps. Recent results have demonstrated that a causal relationship exists...... of variations in erosion rates. Here we present the rationale behind the project, the data available and some preliminary results. The dense seismic and well coverage in the area makes it possible to estimate the rate of deposition of matrix mass. Assuming that sediment storage is not important, this provides...... models. The matrix mass deposition history will be compared with the paleoclimate record (e.g. oxygen isotope curves) to see if the previously observed correlation in the eastern North Sea can be extended to other ages and locations. ...
Deposition of titanium coating on SiC fiber by chemical vapor deposition with Ti-I{sub 2} system
Energy Technology Data Exchange (ETDEWEB)
Luo, Xian, E-mail: luo_shenfan@hotmail.com; Wu, Shuai; Yang, Yan-qing; Jin, Na; Liu, Shuai; Huang, Bin
2017-06-01
Highlights: • The transformation paths of (Ti + I{sub 2}) powder to Ti coating is: Ti + I{sub 2} → (TiI{sub 2}, TiI{sub 3}) → Ti. • Uniform coating was obtained on SiC fiber, but it contained Si and C elements. • Deposition rate of the coating increased with the increase of temperature. • Deposition thickness increased with time and achieved the maximum at 90 min. - Abstract: Titanium coating was prepared on SiC fiber using titanium-iodine (Ti-I{sub 2}) mixture by hot-wall chemical vapor deposition. Thermodynamic analysis and experimental observation were carried out in this work. The thermodynamic analysis of the reactions in the Ti-I{sub 2} system indicates that Ti and I{sub 2} raw powder materials transform to titanium coating as follows: Ti + I{sub 2} → (TiI{sub 2}, TiI{sub 3}), and (TiI{sub 2}, TiI{sub 3}) → Ti. In theory, the conversions of TiI{sub 3} and TiI{sub 2} reach the maximum when Ti:I{sub 2} is 1:1.5, while in actual experiment that reached the maximum when Ti:I{sub 2} was 1:2, as there existed the waste of I{sub 2} due to sublimation. Typical deposited coating is relatively flat and uniform. However, as SiC is prone to react with Ti at high temperatures, the obtained coating contained some Si and C elements except for Ti. So the coating was not a pure Ti coating but contained some carbides and silicides. Deposition rate of the coating increased with the increase of temperature. The deposited thickness increased with the increase of heat preservation time, and achieved the maximum thickness at 90 min.
Long length coated conductor fabrication by inclined substrate deposition and evaporation
Energy Technology Data Exchange (ETDEWEB)
Prusseit, W [THEVA Duennschichttechnik GmbH, Rote-Kreuz-Str. 8, 85737 Ismaning (Germany); Hoffmann, C [THEVA Duennschichttechnik GmbH, Rote-Kreuz-Str. 8, 85737 Ismaning (Germany); Nemetschek, R [THEVA Duennschichttechnik GmbH, Rote-Kreuz-Str. 8, 85737 Ismaning (Germany); Sigl, G [THEVA Duennschichttechnik GmbH, Rote-Kreuz-Str. 8, 85737 Ismaning (Germany); Handke, J [THEVA Duennschichttechnik GmbH, Rote-Kreuz-Str. 8, 85737 Ismaning (Germany); Luemkemann, A [Technical University Munich, James- Franck-Str. 1, 85748 Garching (Germany); Kinder, H [Technical University Munich, James- Franck-Str. 1, 85748 Garching (Germany)
2006-06-01
The commercial development of coated conductors is rapidly progressing. As a result we present an economic route to produce second generation HTS tape from the initial substrate preparation to the final metal coating. The most important and technically challenging steps are the deposition of an oriented buffer layer and the superconductor film in a reel-to-reel configuration. New evaporation techniques have been developed to enable reliable, high rate tape coating. Highly oriented MgO - buffer layers are realized by inclined substrate deposition (ISD) and DyBCO is deposited by simple e-gun evaporation yielding critical currents beyond 200 A/cm. Coated conductors have been fabricated up to 40 m length and are currently tested in a variety of applications.
Health effects of internally deposited radionuclides
International Nuclear Information System (INIS)
Raabe, Otto G.
2008-01-01
A comparative evaluation has been conducted of the ionizing radiation dose-response relationships in both human and laboratory animal studies involving internal deposition of radionuclides including alpha-emitters 226 Ra, 238 Pu, 239 Pu, and 241 Am and beta-emitters 90 Sr, 90 Y and 144 Ce. Intake routes included inhalation, injection, and ingestion. The preeminent importance of dose rate was revealed in this analysis. The lifetime effects of the ionizing radiation from internal emitters are described by three-dimensional dose rate/ time/response surfaces that compete with other causes of death during an individual's lifetime. Using maximum likelihood survival regression methods, the characteristic logarithmic slope for cancer induction was found to be about negative one-third for alpha-emitters or about negative two-thirds for beta-emitters. The relative biological effectiveness (RBE) of alpha versus beta radiations for cancer induction is a strong function of dose rate, near one at high dose rates and greater than 20 at low dose rates. The cumulative dose required to yield any level of induced-cancer risk is less at lower dose rates than at higher dose rates showing an apparent inverse-dose effect (up to a factor of 10 for high LET alpha radiation and a factor of 2 for low LET beta radiation). The competing risks of death associated with radiation injury, radiation-induced cancer, and natural aging are graphically shown using three-dimensional illustrations. At the higher average dose rates the principal deleterious effects are those associated with radiation-induced injury while at intermediate average dose rates radiation-induced cancer predominates. At the lower average dose rates the long latency time required for radiation-induced cancer may exceed natural life span, yielding an apparent lifespan effective threshold for death associated with radiation-induced cancer for cumulative doses to the target tissue below from 1.1 to 1.4 Gy for alpha-emitters or below
Health effects of internally deposited radionuclides
Energy Technology Data Exchange (ETDEWEB)
Raabe, Otto G., E-mail: ograabe@ucdavis.edu [California Univ., Davis, CA (United States). Center for Health and the Environment
2008-07-01
A comparative evaluation has been conducted of the ionizing radiation dose-response relationships in both human and laboratory animal studies involving internal deposition of radionuclides including alpha-emitters {sup 226}Ra, {sup 238}Pu, {sup 239}Pu, and {sup 241}Am and beta-emitters {sup 90}Sr, {sup 90}Y and {sup 144}Ce. Intake routes included inhalation, injection, and ingestion. The preeminent importance of dose rate was revealed in this analysis. The lifetime effects of the ionizing radiation from internal emitters are described by three-dimensional dose rate/ time/response surfaces that compete with other causes of death during an individual's lifetime. Using maximum likelihood survival regression methods, the characteristic logarithmic slope for cancer induction was found to be about negative one-third for alpha-emitters or about negative two-thirds for beta-emitters. The relative biological effectiveness (RBE) of alpha versus beta radiations for cancer induction is a strong function of dose rate, near one at high dose rates and greater than 20 at low dose rates. The cumulative dose required to yield any level of induced-cancer risk is less at lower dose rates than at higher dose rates showing an apparent inverse-dose effect (up to a factor of 10 for high LET alpha radiation and a factor of 2 for low LET beta radiation). The competing risks of death associated with radiation injury, radiation-induced cancer, and natural aging are graphically shown using three-dimensional illustrations. At the higher average dose rates the principal deleterious effects are those associated with radiation-induced injury while at intermediate average dose rates radiation-induced cancer predominates. At the lower average dose rates the long latency time required for radiation-induced cancer may exceed natural life span, yielding an apparent lifespan effective threshold for death associated with radiation-induced cancer for cumulative doses to the target tissue below from 1.1 to
Microstructure of ZnO thin films deposited by high power impulse magnetron sputtering
Energy Technology Data Exchange (ETDEWEB)
Reed, A.N., E-mail: amber.reed.5@us.af.mil [Materials and Manufacturing Directorate, Air Force Research Laboratory, 3005 Hobson Way, Wright Patterson Air Force Base, OH 45433 (United States); Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH 45469 (United States); Shamberger, P.J. [Department of Materials Science and Engineering, Texas A& M University, College Station, TX 77843 (United States); Hu, J.J. [Materials and Manufacturing Directorate, Air Force Research Laboratory, 3005 Hobson Way, Wright Patterson Air Force Base, OH 45433 (United States); University of Dayton Research Institute, University of Dayton, Dayton, OH 45469 (United States); Muratore, C. [Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH 45469 (United States); Bultman, J.E. [Materials and Manufacturing Directorate, Air Force Research Laboratory, 3005 Hobson Way, Wright Patterson Air Force Base, OH 45433 (United States); University of Dayton Research Institute, University of Dayton, Dayton, OH 45469 (United States); Voevodin, A.A., E-mail: andrey.voevodin@us.af.mil [Materials and Manufacturing Directorate, Air Force Research Laboratory, 3005 Hobson Way, Wright Patterson Air Force Base, OH 45433 (United States)
2015-03-31
High power impulse magnetron sputtering was used to deposit thin (~ 100 nm) zinc oxide (ZnO) films from a ceramic ZnO target onto substrates heated to 150 °C. The resulting films had strong crystallinity, highly aligned (002) texture and low surface roughness (root mean square roughness less than 10 nm), as determined by X-ray diffraction, transmission electron microscopy, scanning electron microscopy and atomic force spectroscopy measurements. Deposition pressure and target–substrate distance had the greatest effect on film microstructure. The degree of alignment in the films was strongly dependent on the gas pressure. Deposition at pressures less than 0.93 Pa resulted in a bimodal distribution of grain sizes. An initial growth layer with preferred orientations (101) and (002) parallel to the interface was observed at the film–substrate interface under all conditions examined here; the extent of that competitive region was dependent on growth conditions. Time-resolved current measurements of the target and ion energy distributions, determined using energy resolved mass spectrometry, were correlated to film microstructure in order to investigate the effect of plasma conditions on film nucleation and growth. - Highlights: • Low temperature growth of nanocrystalline zinc oxide (ZnO) films. • ZnO films had a highly (002) textured, smooth, dense microstructure. • Dominant (002) orientation of films was pressure dependent. • Interfacial (101)/(002) mixed orientation layer controlled by substrate location.
Simulation of nitrogen deposition in the North China Plain by the FRAME model
Directory of Open Access Journals (Sweden)
Y. Zhang
2011-11-01
Full Text Available Simulation of atmospheric nitrogen (N deposition in the North China Plain (NCP at high resolution, 5 × 5 km2, was conducted for the first time by the Fine Resolution Atmospheric Multi-pollutant Exchange (FRAME model. The total N deposition budget was 1481 Gg in this region, with 77 % from reduced N and 23 % from oxidized N, and the annual deposition rate (47 kg N ha−1 was much higher than previously reported values for other parts of the world such as the UK (13 kg N ha−1, Poland (7.3 kg N ha−1 and EU27 (8.6 kg N ha−1. The exported N component (1981 Gg was much higher than the imported N component (584 Gg, suggesting that the NCP is an important net emission source of N pollutants. Contributions of N deposition budgets from the seven provinces in this region were proportional to their area ratios. The calculated spatial distributions of N deposition displayed high rates of reduced N deposition in the south and of oxidized N deposition in the eastern part. The N deposition exceeded an upper limit of 30 kg N ha−1 for natural ecosystems over more than 90 % of the region, resulting in terrestrial ecosystem deterioration, impaired air quality and coastal eutrophication not only in the NCP itself but also in surrounding areas including the Bohai Sea and the Yellow Sea.
Post-depositional fracturing and subsidence of pumice flow deposits: Lascar Volcano, Chile.
Whelley, Patrick L; Jay, J; Calder, E S; Pritchard, M E; Cassidy, N J; Alcaraz, S; Pavez, A
Unconsolidated pyroclastic flow deposits of the 1993 eruption of Lascar Volcano, Chile, have, with time, become increasingly dissected by a network of deeply penetrating fractures. The fracture network comprises orthogonal sets of decimeter-wide linear voids that form a pseudo-polygonal grid visible on the deposit surface. In this work, we combine shallow surface geophysical imaging tools with remote sensing observations and direct field measurements of the deposit to investigate these fractures and their underlying causal mechanisms. Based on ground penetrating radar images, the fractures are observed to have propagated to depths of up to 10 m. In addition, orbiting radar interferometry shows that deposit subsidence of up to 1 cm/year -1 occurred between 1993 and 1996 with continued subsidence occurring at a slower rate thereafter. In situ measurements show that 1 m below the surface, the 1993 deposits remain 5°C to 15°C hotter, 18 years after emplacement, than adjacent deposits. Based on the observed subsidence as well as estimated cooling rates, the fractures are inferred to be the combined result of deaeration, thermal contraction, and sedimentary compaction in the months to years following deposition. Significant environmental factors, including regional earthquakes in 1995 and 2007, accelerated settling at punctuated moments in time. The spatially variable fracture pattern relates to surface slope and lithofacies variations as well as substrate lithology. Similar fractures have been reported in other ignimbrites but are generally exposed only in cross section and are often attributed to formation by external forces. Here we suggest that such interpretations should be invoked with caution, and deformation including post-emplacement subsidence and fracturing of loosely packed ash-rich deposits in the months to years post-emplacement is a process inherent in the settling of pyroclastic material.
Energy Technology Data Exchange (ETDEWEB)
Trautner, F. [Inst. fuer Strahlenschutz, GSF-Forschungszentrum fuer Umwelt und Gesundheit GmbH, Neuherberg (Germany); Tschiersch, J. [Inst. fuer Strahlenschutz, GSF-Forschungszentrum fuer Umwelt und Gesundheit GmbH, Neuherberg (Germany)
1993-11-01
During autumnal and winterly radiation fog events size fractioned sampling of aerosol rime and fogwater was carried out. Samples were collected on polyethylene plates with a surface of 0.25 m{sup 2}. The deposited fog water quantity was as high as 15g/h.m{sup 2}. Deposition rate values were between 10{sup -4} and 10{sup -2} m/s. (orig./EW) [Deutsch] Waehrend herbstlichen und winterlichen Strahlungsnebelereignissen wurde direkt nach der groessenfraktionierenden Probennahme von Aerosol Reif und Nebelwasser auf Polyethylenplatten von 0,25 m{sup 2} Oberflaeche gesammelt. Die deponierte Nebelwassermasse betrug dabei bis zu 15 g/h . m{sup 2}. Fuer Elemente, die sowohl im Wasser als auch im Aerosol analysiert wurden erreichten die Depositionsgeschwindigkeiten Werte zwischen 10{sup -4} und 10{sup -2} m/s. (orig.)
Xiao, Wei; Xia, Hui; Fuh, Jerry Y. H.; Lu, Li
2010-05-01
CNT/MnO2 (birnessite-type) composite films have been successfully deposited on Ni-foil substrate via electrophoretic deposition (EPD). The unique EPD CNT/MnO2 composite film electrode shows enhanced electrical conductivity, good contact between composite films and the substrate and open porous structure, which makes the EPD composite films a promising electrode for high-power supercapacitors and lithium ion batteries.
Coating material innovation in conjunction with optimized deposition technologies
International Nuclear Information System (INIS)
Stolze, M.; Leitner, K.
2009-01-01
Concentrating on physical vapour deposition methods several examples of recently developed coating materials for optical applications were studied for film deposition with optimized coating technologies: mixed evaporation materials for ion assisted deposition with modern plasma ion sources, planar metal and oxide sputter targets for Direct Current (DC) and Mid-Frequency (MF) pulsed sputter deposition and planar and rotatable sputter targets of transparent conductive oxides (TCO) for large-area sputter deposition. Films from specially designed titania based mixed evaporation materials deposited with new plasma ion sources and possible operation with pure oxygen showed extended ranges of the ratio between refractive index and structural film stress, hence there is an increased potential for the reduction of the total coating stress in High-Low alternating stacks and for coating plastics. DC and MF-pulsed sputtering of niobium metal and suboxide targets for optical coatings yielded essential benefits of the suboxide targets in a range of practical coating conditions (for absent in-situ post-oxidation ability): higher refractive index and deposition rate, better reproducibility and easier process control, and the potential for co-deposition of several targets. Technological progress in the manufacture of rotatable indium tin oxide (ITO) targets with regard to higher wall-thickness and density was shown to be reflected in higher material stock and coater up-time, economical deposition rates and stable process behaviour. Both for the rotatable ITO targets and higher-dense aluminum-doped zinc oxide (AZO) planar targets values of film transmittance and resistivity were in the range of the best values industrially achieved for films from the respective planar targets. The results for the rotatable ITO and planar AZO targets point to equally optimized process and film properties for the optimized rotatable AZO targets currently in testing
Rapid and highly efficient growth of graphene on copper by chemical vapor deposition of ethanol
Energy Technology Data Exchange (ETDEWEB)
Lisi, Nicola, E-mail: nicola.lisi@enea.it [ENEA, Materials Technology Unit, Surface Technology Laboratory, Casaccia Research Centre, Via Anguillarese 301, 00123 Rome (Italy); Buonocore, Francesco; Dikonimos, Theodoros; Leoni, Enrico [ENEA, Materials Technology Unit, Surface Technology Laboratory, Casaccia Research Centre, Via Anguillarese 301, 00123 Rome (Italy); Faggio, Giuliana; Messina, Giacomo [Dipartimento di Ingegneria dell' Informazione, delle Infrastrutture e dell' Energia Sostenibile (DIIES), Università “Mediterranea” di Reggio Calabria, 89122 Reggio Calabria (Italy); Morandi, Vittorio; Ortolani, Luca [CNR-IMM Bologna, Via Gobetti 101, 40129 Bologna (Italy); Capasso, Andrea [ENEA, Materials Technology Unit, Surface Technology Laboratory, Casaccia Research Centre, Via Anguillarese 301, 00123 Rome (Italy)
2014-11-28
The growth of graphene by chemical vapor deposition on metal foils is a promising technique to deliver large-area films with high electron mobility. Nowadays, the chemical vapor deposition of hydrocarbons on copper is the most investigated synthesis method, although many other carbon precursors and metal substrates are used too. Among these, ethanol is a safe and inexpensive precursor that seems to offer favorable synthesis kinetics. We explored the growth of graphene on copper from ethanol, focusing on processes of short duration (up to one min). We investigated the produced films by electron microscopy, Raman and X-ray photoemission spectroscopy. A graphene film with high crystalline quality was found to cover the entire copper catalyst substrate in just 20 s, making ethanol appear as a more efficient carbon feedstock than methane and other commonly used precursors. - Highlights: • Graphene films were grown by fast chemical vapor deposition of ethanol on copper. • High-temperature/short-time growth produced highly crystalline graphene. • The copper substrate was entirely covered by a graphene film in just 20 s. • Addition of H{sub 2} had a negligible effect on the crystalline quality.
Energy Technology Data Exchange (ETDEWEB)
Toprac, A.J.; Trachtenberg, I.; Edgar, T.F. (Univ. of Texas, Austin, TX (United States). Dept. of Chemical Engineering)
1994-06-01
The chemical vapor deposition of polysilicon from thermally activated silane in a cold wall, single-wafer rapid thermal system was studied by experimentation at a variety of low pressure conditions, including very high temperatures. The effect of diluent gas on polysilicon deposition rates was examined using hydrogen, helium, and krypton. A mass-transfer model for the chemical vapor deposition of polysilicon in a cold wall, rapid thermal system was developed. This model was used to produce an empirical rate expression for silicon deposition from silane by regressing kinetic parameters to fit experimental data. The resulting model provided accurate predictions over widely varying conditions in the experimental data.
Lu, Yi; Kondo, Hiroki; Ishikawa, Kenji; Oda, Osamu; Takeda, Keigo; Sekine, Makoto; Amano, Hiroshi; Hori, Masaru
2014-04-01
Gallium nitride (GaN) films have been grown by using our newly developed Radical-Enhanced Metalorganic Chemical Vapor Deposition (REMOCVD) system. This system has three features: (1) application of very high frequency (60 MHz) power in order to increase the plasma density, (2) introduction of H2 gas together with N2 gas in the plasma discharge region to generate not only nitrogen radicals but also active NHx molecules, and (3) radical supply under remote plasma arrangement with suppression of charged ions and photons by employing a Faraday cage. Using this new system, we have studied the effect of the trimethylgallium (TMG) source flow rate and of the plasma generation power on the GaN crystal quality by using scanning electron microscopy (SEM) and double crystal X-ray diffraction (XRD). We found that this REMOCVD allowed the growth of epitaxial GaN films of the wurtzite structure of (0001) orientation on sapphire substrates with a high growth rate of 0.42 μm/h at a low temperature of 800 °C. The present REMOCVD is a promising method for GaN growth at relatively low temperature and without using costly ammonia gas.
Papadimitropoulos, G; Davazoglou, D
2011-09-01
In this work we study the hot-wire chemical vapor deposition (HWCVD) of copper films on blanket and patterned substrates at high filament temperatures. A vertical chemical vapor deposition reactor was used in which the chemical reactions were assisted by a tungsten filament heated at 650 degrees C. Hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (CupraSelect) vapors were used, directly injected into the reactor with the aid of a liquid injection system using N2 as carrier gas. Copper thin films grown also by thermal and hot-wire CVD. The substrates used were oxidized silicon wafers on which trenches with dimensions of the order of 500 nm were formed and subsequently covered with LPCVD W. HWCVD copper thin films grown at filament temperature of 650 degrees C showed higher growth rates compared to the thermally ones. They also exhibited higher resistivities than thermal and HWCVD films grown at lower filament temperatures. Thermally grown Cu films have very uniform deposition leading to full coverage of the patterned substrates while the HWCVD films exhibited a tendency to vertical growth, thereby creating gaps and incomplete step coverage.
Atmospheric deposition of 137Cs between 1994 and 2002 at Cienfuegos, Cuba
International Nuclear Information System (INIS)
Alonso-Hernandez, C.M.; Cartas-Aguila, H.; Diaz-Asencio, M.; Munoz-Caravaca, A.; Martin-Perez, J.; Sibello-Hernandez, R.
2006-01-01
Levels of 137 Cs in total atmospheric deposition have been measured in the Cienfuegos region (Cuba) between 1994 and 2002. Samples were collected every three months, evaporated to dryness to obtain residual samples, and measured by gamma spectrometry. The 137 Cs mean concentration in total deposition was 0.24 Bq m -2 and data ranged between -2 . Precipitation rates and raintime have proved to be the most important factors controlling the concentration and depositional flux of 137 Cs in the atmosphere over Cienfuegos, showing a high correlation coefficient (R = 0.93)
Directory of Open Access Journals (Sweden)
N. Badi
2015-12-01
Full Text Available The dielectric integrity has been one of the major obstacle in bringing out capacitor devices with suitable performance characteristics at high temperatures. In this paper, BxNyOz dielectric films for high temperature capacitors solutions are investigated. The films were grown on silicon substrate by using ion source assisted physical vapor deposition technique. The as-grown films were characterized by SEM, XRD, and XPS. The capacitor structures were fabricated using BxNyOz as a dielectric and titanium as metal electrodes. The elaborated devices were subjected to electrical and thermal characterization. They exhibited low electrical loss and very good stability when subjected to high temperature for a prolonged period of time.
International Nuclear Information System (INIS)
Kim, Namsu; Graham, Samuel
2013-01-01
A flexible thin-film encapsulation architecture for organic electronics was built and consisted of a silicon oxide/alumina and parylene layer deposited over Ca sensors on a barrier-coated polyethylene terephthalate substrate. The film's effective water vapor transmission rate was 2.4 ± 1.5 × 10 −5 g/m 2 /day at 20 °C and 50% relative humidity. Flexural tests revealed that for films deposited on the polyethylene terephthalate substrate, the barrier layer failed due to cracking at a curvature radius of 6.4 mm, corresponding to a strain of 0.8%. Adding an epoxy top coat of suitable thickness shifted the neutral axis toward the encapsulation layer, reducing the induced strain. Barrier performance was maintained under the 6.4 mm radius of curvature in this encapsulation structure. Thus, shifting the neutral axis via device structural design is an effective method of extending the flexibility of thin-film encapsulation structure without compromising the performance loss as a barrier layer. - Highlights: • High performance barrier is fabricated on flexible substrate. • The water vapor transmission rate is 2.4 ± 1.5 × 10 −5 g/m 2 /day. • The structure maintains its performance under a small radius of bending curvature
Monetary determinants of deposit euroization in European post-transition countries
Tkalec Marina
2013-01-01
This paper investigates the long-run and short-run relationship between deposit euroization in twelve European post-transition economies and two determinants of deposit euroization that are under the influence of monetary policy: the exchange rate and the interest rate differential. The link between deposit euroization, exchange rates and interest rate differentials is investigated using Johansen cointegration and error correction models for each country separately. The results suggest ...
Deposition of low stress, high transmittance SiC as an x-ray mask membrane using ECR plasma CVD
Lee, S Y; Lim, S T; Ahn, J H
1998-01-01
SiC for x-ray mask membrane is deposited by Electron Cyclotron Resonance plasma Chemical Vapor Deposition from SiH sub 4 /CH sub 4 Ar mixtures. Stoichiometric SiC is deposited at SiH sub 4 /CH sub 4 ratio of 0.4, deposition temperature of 600.deg.C and microwave power of 500 W with +- 5% thickness uniformity, As-deposited film has compressive residual stress, very smooth surface (31 A rms) and high optical transmittance of 90% at 633 nm wavelength. The microstructure of this film consists of the nanocrystalline particle (100 A approx 200A) embedded in amorphous matrix. Residual stress can be turned to tensile stress via Rapid Thermal Annealing in N sub 2 atmosphere, while suppressing structural change during annealing, As a result, smooth (37 A rms) SiC film with moderate tensile stress and high optical transmittance (85% at 633 nm wavelength) is obtained.
Heat Treatment of Gas-Atomized Powders for Cold Spray Deposition
Story, William A.; Brewer, Luke N.
2018-02-01
This communication demonstrates the efficacy of heat treatment on the improved deposition characteristics of aluminum alloy powders. A novel furnace was constructed for solutionizing of feedstock powders in an inert atmosphere while avoiding sintering. This furnace design achieved sufficiently high cooling rates to limit re-precipitation during powder cooling. Microscopy showed homogenization of the powder particle microstructures after heat treatment. Cold spray deposition efficiency with heat-treated powders substantially increased for the alloys AA2024, AA6061, and AA7075.
Use of Calluna vulgaris to detect signals of nitrogen deposition across an urban-rural gradient
Power, S. A.; Collins, C. M.
2010-05-01
Densely populated cities can experience high concentrations of traffic-derived pollutants, with oxides of nitrogen and ammonia contributing significantly to the overall nitrogen (N) budget of urban ecosystems. This study investigated changes in the biochemistry of in situ Calluna vulgaris plants to detect signals of N deposition across an urban-rural gradient from central London to rural Surrey, UK. Foliar N concentrations and δ 15N signatures were higher, and C/N ratios lower, in urban areas receiving the highest rates of N deposition. Plant phosphorus (P) concentrations were also highest in these areas, suggesting that elevated rates of N deposition are unlikely to result in progressive P-limitation in urban habitats. Free amino acid concentrations were positively related to N deposition for asparagine, glutamine, glycine, phenylalanine, isoleucine, leucine and lysine. Overall, relationships between tissue chemistry and N deposition were similar for oxidised, reduced and total N, although the strength of relationships varied with the different biochemical indicators. The results of this study indicate that current rates of N deposition are having substantial effects on plant biochemistry in urban areas, with likely implications for the biodiversity and functioning of urban ecosystems.
Rapid deposition process for zinc oxide film applications in pyroelectric devices
International Nuclear Information System (INIS)
Hsiao, Chun-Ching; Yu, Shih-Yuan
2012-01-01
Aerosol deposition (AD) is a rapid process for the deposition of films. Zinc oxide is a low toxicity and environmentally friendly material, and it possesses properties such as semiconductivity, pyroelectricity and piezoelectricity without the poling process. Therefore, AD is used to accelerate the manufacturing process for applications of ZnO films in pyroelectric devices. Increasing the temperature variation rate in pyroelectric films is a useful method for enhancing the responsivity of pyroelectric devices. In the present study, a porous ZnO film possessing the properties of large heat absorption and high temperature variation rate is successfully produced by the AD rapid process and laser annealing for application in pyroelectric devices. (paper)
Plasma enhanced atomic layer deposited MoOx emitters for silicon heterojunction solar cells
Ziegler, J.; Mews, M.; Kaufmann, K.; Schneider, T.; Sprafke, A.N.; Korte, L.; Wehrsporn, R.B
2015-01-01
A method for the deposition of molybdenum oxide MoOx with high growth rates at temperatures below 200 C based on plasma enhanced atomic layer deposition is presented. The stoichiometry of the overstoichiometric MoOx films can be adjusted by the plasma parameters. First results of these layers acting as hole selective contacts in silicon heterojunction solar cells are presented and discussed
Deposition and growth of domains in one dimension
Rodgers, G. J.; Tavassoli, Z.
1998-09-01
A model of deposition and growth in one dimension is studied in which finite sized domains are deposited by the random sequential adsorption process. The domains then grow with a time dependent growth rate. When the initial deposited domains are monomers and dimers the coverage is found exactly for a number of different growth rates. A continuum version of this model is also considered.
International Nuclear Information System (INIS)
Ogale, S.B.
1992-01-01
This paper describes the use of pulsed excimer laser ablation technique for deposition of high quality superconductor thin films on different substrate materials such as Y stabilized ZrO 2 , SrTiO 3 , LiNbO 3 , Silicon and Stainless Steels, and dopant incorporation during the film depositions. Processing of deposited films using ion and laser beams for realisation of device features are presented. 28 refs., 16 figs
Energy Technology Data Exchange (ETDEWEB)
Jackson, David H. K., E-mail: david.jackson@wisc.edu; Kuech, Thomas F. [Materials Science Program, University of Wisconsin–Madison, Madison, Wisconsin 53706 and Department of Chemical and Biological Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States); Laskar, Masihhur R.; Ellis, Ryan G. [Department of Chemical and Biological Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States); Fang, Shuyu; Hamers, Robert J. [Department of Chemistry, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States); Xu, Shenzhen; Li, Xiaoqing; Morgan, Dane [Department of Materials Science and Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States); Dreibelbis, Mark [Core R& D, Inorganic Materials and Heterogeneous Catalysis, The Dow Chemical Company, Midland, Michigan 48674 (United States); Babcock, Susan E. [Materials Science Program, University of Wisconsin–Madison, Madison, Wisconsin 53706 and Department of Materials Science and Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States); Mahanthappa, Mahesh K. [Materials Science Program, University of Wisconsin–Madison, Madison, Wisconsin 53706 and Department of Chemistry, University of Wisconsin–Madison, Madison, Wisconsin 53706 (United States)
2016-05-15
Atomic layer deposition (ALD) of conformal AlF{sub 3} coatings onto both flat silicon substrates and high-voltage LiNi{sub 0.5}Mn{sub 0.3}Co{sub 0.2}O{sub 2} (NMC) Li-ion battery cathode powders was investigated using a Al(CH{sub 3}){sub 3}/TaF{sub 5} precursor combination. This optimized approach employs easily handled ALD precursors, while also obviating the use of highly toxic HF(g). In studies conducted on planar Si wafers, the film's growth mode was dictated by a competition between the desorption and decomposition of Ta reaction byproducts. At T ≥ 200 °C, a rapid decomposition of the Ta reaction byproducts to TaC led to continuous deposition and high concentrations of TaC in the films. A self-limited ALD growth mode was found to occur when the deposition temperature was reduced to 125 °C, and the TaF{sub 5} exposures were followed by an extended purge. The lower temperature process suppressed conversion of TaF{sub x}(CH{sub 3}){sub 5−x} to nonvolatile TaC, and the long purges enabled nearly complete TaF{sub x}(CH{sub 3}){sub 5−x} desorption, leaving behind the AlF{sub 3} thin films. NMC cathode powders were coated using these optimized conditions, and coin cells employing these coated cathode particles exhibited significant improvements in charge capacity fade at high discharge rates.
Henley, R.W.; Berger, B.R.
2011-01-01
Large bulk-tonnage high-sulfidation gold deposits, such as Yanacocha, Peru, are the surface expression of structurally-controlled lode gold deposits, such as El Indio, Chile. Both formed in active andesite-dacite volcanic terranes. Fluid inclusion, stable isotope and geologic data show that lode deposits formed within 1500. m of the paleo-surface as a consequence of the expansion of low-salinity, low-density magmatic vapor with very limited, if any, groundwater mixing. They are characterized by an initial 'Sulfate' Stage of advanced argillic wallrock alteration ?? alunite commonly with intense silicification followed by a 'Sulfide' Stage - a succession of discrete sulfide-sulfosalt veins that may be ore grade in gold and silver. Fluid inclusions in quartz formed during wallrock alteration have homogenization temperatures between 100 and over 500 ??C and preserve a record of a vapor-rich environment. Recent data for El Indio and similar deposits show that at the commencement of the Sulfide Stage, 'condensation' of Cu-As-S sulfosalt melts with trace concentrations of Sb, Te, Bi, Ag and Au occurred at > 600 ??C following pyrite deposition. Euhedral quartz crystals were simultaneously deposited from the vapor phase during crystallization of the vapor-saturated melt occurs to Fe-tennantite with progressive non-equilibrium fractionation of heavy metals between melt-vapor and solid. Vugs containing a range of sulfides, sulfosalts and gold record the changing composition of the vapor. Published fluid inclusion and mineralogical data are reviewed in the context of geological relationships to establish boundary conditions through which to trace the expansion of magmatic vapor from source to surface and consequent alteration and mineralization. Initially heat loss from the vapor is high resulting in the formation of acid condensate permeating through the wallrock. This Sulfate Stage alteration effectively isolates the expansion of magmatic vapor in subsurface fracture arrays
Sanchez-Valencia, Juan Ramon; Longtin, Remi; Rossell, Marta D; Gröning, Pierangelo
2016-04-06
We report a new methodology based on glancing angle deposition (GLAD) of an organic molecule in combination with perpendicular growth of a second inorganic material. The resulting thin films retain a very well-defined tilted columnar microstructure characteristic of GLAD with the inorganic material embedded inside the columns. We refer to this new methodology as growth assisted by glancing angle deposition or GAGLAD, since the material of interest (here, the inorganic) grows in the form of tilted columns, though it is deposited under a nonglancing configuration. As a "proof of concept", we have used silver and zinc oxide as the perpendicularly deposited material since they usually form ill-defined columnar microstructures at room temperature by GLAD. By means of our GAGLAD methodology, the typical tilted columnar microstructure can be developed for materials that otherwise do not form ordered structures under conventional GLAD. This simple methodology broadens significantly the range of materials where control of the microstructure can be achieved by tuning the geometrical deposition parameters. The two examples presented here, Ag/Alq3 and ZnO/Alq3, have been deposited by physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD), respectively: two different vacuum techniques that illustrate the generality of the proposed technique. The two type of hybrid samples present very interesting properties that demonstrate the potentiality of GAGLAD. On one hand, the Ag/Alq3 samples present highly optical anisotropic properties when they are analyzed with linearly polarized light. To our knowledge, these Ag/Alq3 samples present the highest angular selectivity reported in the visible range. On the other hand, ZnO/Alq3 samples are used to develop highly porous ZnO thin films by using Alq3 as sacrificial material. In this way, antireflective ZnO samples with very low refractive index and extinction coefficient have been obtained.
Deposition of highly oriented (K,Na)NbO3 films on flexible metal substrates
DEFF Research Database (Denmark)
Grivel, Jean-Claude; Thydén, Karl; Bowen, Jacob R.
2018-01-01
In view of developing flexible, highly textured Pb-free piezoelectric thin films, (K,Na)NbO3 was deposited by chemical solution deposition on cube-textured Ni-W alloy substrates. After heat treatment, a strong (001)pc out-of-plane preferential orientation is created in the (K,Na)NbO3 layer, which...
Helo, Christoph; Clague, David A.; Dingwell, Donald B.; Stix, John
2013-03-01
We present a calorimetric analysis of pyroclastic glasses and glassy sheet lava flow crusts collected on Axial Seamount, Juan de Fuca Ridge, NE Pacific Ocean, at a water depth of about 1400 m. The pyroclastic glasses, subdivided into thin limu o Pele fragments and angular, blocky clasts, were retrieved from various stratigraphic horizons of volcaniclastic deposits on the upper flanks of the volcanic edifice. Each analysed pyroclastic sample consists of a single type of fragment from one individual horizon. The heat capacity (cp) was measured via differential scanning calorimetry (DSC) and analysed using relaxation geospeedometry to obtain the natural cooling rate across the glass transition. The limu o Pele samples (1 mm grain size fraction) and angular fragments (0.5 mm grain size fraction) exhibit cooling rates of 104.3 to 106.0 K s- 1 and 103.9 to 105.1 K s- 1, respectively. A coarser grain size fraction, 2 mm for limu o Pele and 1 mm for the angular clasts yields cooling rates at the order of 103.7 K s- 1. The range of cooling rates determined for the different pyroclastic deposits presumably relates to the size or intensity of the individual eruptions. The outer glassy crusts of the sheet lava flows were naturally quenched at rates between 63 K s- 1 and 103 K s- 1. By comparing our results with published data on the very slow quenching of lava flow crusts, we suggest that (1) fragmentation and cooling appear to be coupled dynamically and (2) ductile deformation upon the onset of cooling is restricted due to the rapid increase in viscosity. Lastly, we suggest that thermally buoyant plumes that may arise from rapid heat transfer efficiently separate clasts based on their capability to rise within the plume and as they subsequently settle from it.
CANOPY STRUCTURE AND DEPOSITION EFFICIENCY OF VINEYARD SPRAYERS
Directory of Open Access Journals (Sweden)
Gianfranco Pergher
2007-06-01
Full Text Available A field study was performed to analyse how deposition efficiency from an axial-fan sprayer was affected by the canopy structure of vines trained to the High Cordon, Low Cordon and Casarsa systems, at beginning of flowering and beginning of berry touch growth stages. An empirical calibration method, providing a dose rate adjustment roughly proportional to canopy height, was used. The canopy structure was assessed using the Point Quadrat method, and determining the leaf area index (LAI and the leaf layer index (LLI. Spray deposits were measured by colorimetry, using a water soluble dye (Tartrazine as a tracer. Correlation between deposits and canopy parameters were analysed and discussed. Foliar deposits per unit leaf area were relatively constant, suggesting that empirical calibration can reduce deposit variability associated with different training systems and growth stages. Total foliar deposition ranged from 33.6% and 82.3% of total spray volume, and increased proportionally with the LLI up to LLI<4. Deposits on bunches significantly decreased with the LLI in the grape zone. The results suggest that sprayer efficiency is improved by a regular, symmetrical canopy, with few leaf layers in the grape zone as in Low Cordon. However, a LLI<3 over the whole canopy and >40% gaps in the foliage both reduced total deposition, and may increase the risk for larger drift losses.
Dispersion, deposition and resuspension of atmospheric contaminants
International Nuclear Information System (INIS)
Anon.
1985-01-01
The following topics are discussed: dry deposition, oil shale fugitive air emissions, particle resuspension and translocation, theoretical studies and applications, and processing of emissions by clouds and precipitation. The concentration of contaminant species in air is governed by the rate of input from sources, the rate of dilution or dispersion as a result of air turbulence, and the rate of removal to the surface by wet and dry deposition processes. Once on the surface, contaminants also may be resuspended, depending on meteorological and surface conditions. An understanding of these processes is necessary for accurate prediction of exposures of hazardous or harmful contaminants to humans, animals, and crops. In the field, plume dispersion and plume depletion by dry deposition were studied by the use of tracers. Dry deposition was investigated for particles of both respiration and inhalation interest. Complementary dry deposition studies of particles to rock canopies were conducted under controlled conditions in a wind tunnel. Because of increasing concern about hazardous, organic gases in the atmosphere some limited investigations of the dry deposition of nitrobenzene to a lichen mat were conducted in a stirred chamber. Resuspension was also studied using tracers and contaminated surfaces and in the wind tunnel. The objective of the resuspension studies was to develop and verify models for predicting the airborne concentrations of contaminants over areas with surface contamination, develop resuspension rate predictors for downwind transport, and develop predictors for resuspension input to the food chain. These models will be of particular relevance to the evaluation of deposition and resuspension of both radionuclides and chemical contaminants
Field Measurements and Modeling of Dust Transport and Deposition on a Hawaiian Volcano
Douglas, M.; Stock, J. D.; Cerovski-Darriau, C.; Bishaw, K.; Bedford, D.
2017-12-01
The western slopes of Hawaii's Mauna Kea volcano are mantled by fine-grained soils that record volcanic airfall and eolian deposition. Where exposed, strong winds transport this sediment across west Hawaii, affecting tourism and local communities by decreasing air and water quality. Operations on US Army's Ke'amuku Maneuver Area (KMA) have the potential to increase dust flux from these deposits. To understand regional dust transport and composition, the USGS established 18 ground monitoring sites and sampling locations surrounding KMA. For over three years, each station measured vertical and horizontal dust flux while co-located anemometers measured wind speed and direction. We use these datasets to develop a model for dust supply and transport to assess whether KMA is a net dust sink or source. We find that horizontal dust flux rates are most highly correlated with entrainment threshold wind speeds of 8 m/s. Using a dust model that partitions measured horizontal dust flux into inward- and outward-directed components, we predict that KMA is currently a net dust sink. Geochemical analysis of dust samples illustrates that organics and pedogenic carbonate make up to 70% of their mass. Measured vertical dust deposition rates of 0.005 mm/m2/yr are similar to deposition rates of 0.004 mm/m2/yr predicted from the divergence of dust across KMA's boundary. These rates are low compared to pre-historic rates of 0.2-0.3 mm/yr estimated from radiocarbon dating of buried soils. Therefore, KMA's soils record persistent deposition both over past millennia and at present at rates that imply infrequent, large dust storms. Such events led to soil-mantled topography in an otherwise rocky Pleistocene volcanic landscape. A substantial portion of fine-grained soils in other leeward Hawaiian Island landscapes may have formed from similar eolian deposition, and not direct weathering of parent rock.
A lithium deposition system for tokamak devices*
Graziul, Christopher; Majeski, Richard; Kaita, Robert; Hoffman, Daniel; Timberlake, John; Card, David
2002-11-01
The production of a lithium deposition system using commercially available components is discussed. This system is intended to provide a fresh lithium wall coating between discharges in a tokamak. For this purpose, a film 100-200 Å thick is sufficient to ensure that the plasma interacts solely with the lithium. A test system consisting of a lithium evaporator and a deposition monitor has been designed and constructed to investigate deposition rates and coverage. A Thermionics 3kW e-gun is used to rapidly evaporate small amounts of solid lithium. An Inficon XTM/2 quartz deposition monitor then measures deposition rate at varying distances, positions and angles relative to the e-gun crucible. Initial results from the test system will be presented. *Supported by US DOE contract #DE-AC02-76CH-03073
Development and evaluation of a long-term deposit probe for on-line monitoring of deposit growth
Energy Technology Data Exchange (ETDEWEB)
Brink, Anders; Lauren, Tor; Yrjas, Patrik; Hupa, Mikko [Process Chemistry Centre, Aabo Akademi University, Biskopsgatan 8, FI-20540 Turku (Finland); Friesenbichler, Joachim [Institute for Resource Efficient and Sustainable Systems, Technical University Graz Inffeldg. 21b, A-8010 Graz (Austria)
2007-12-15
A newly designed air-cooled probe for on-line monitoring of deposition growth has been tested in a boiler firing three woody fuels. Thermocouples are mounted on both sides of the tube wall enabling measurements of the heat flux through the probe wall. Knowing the heat flux through the probe wall, it is possible to measure the additional heat transfer resistance caused by the deposit and to estimate the properties of the deposit. Calculating the deposit thickness using the collected temperature data indicated the thinnest deposit when wood was fired, followed by bark and waste wood. The calculated deposit thickness was larger than those found when analysing the deposit thickness after the probe had been removed. Nevertheless, the ranking of fuels by deposit build-up rate was the same. (author)