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Sample records for hankyo yudensei ekisho

  1. Development and utilization of liquid quartz light modulating film. Ekisho choko film no kaihatsu to riyo

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, M. (Ajinomoto Co. Inc., Tokyo (Japan))

    1992-03-01

    This paper introduces the polymer dispersed liquid crystal (PDLC) ACT'' sheet, a liquid quartz light modulating film, developed by the Ajinomoto Company in Japan. A mixture of liquid crystal and polymer precursor is sandwiched between polyethylene terephthalate films imparted with transparency conductor made of indium tin oxide (ITO), which is then polymerized by heating or irradiating ultraviolet rays to obtain a PDLC. The film has a thickness as thin as about 0.3 mm, and good processibility. The sheet uses light modulating elements functioning on scatter and permeation of light. Clarification was made on the voltage dependence of cloudiness, total light permeability, straight and parallel light permeability, the response, and the operating voltage. The system consumes small amount of power with a threshold value of about 35V, and is suitable to operate large areas when working on the utility power supply. An incident light having a high diffusion capability when the electric field is turned off exhibits a high clouding function. The system gives an excellent feel of colorlessness and transparency when the electric field is turned on. The performances in heat insulation, infrared reflection capability and noise resistance are expected to be compounded for a functional versatility. 4 refs., 6 figs., 2 tabs.

  2. Super high precision 200 ppi liquid crystal display series; Chokoseido 200 ppi ekisho display series

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2000-03-01

    In mobile equipment, in demand is a high precision liquid crystal display (LCD) having the power of expression equivalent to printed materials like magazines because of the necessity of displaying a large amount of information on a easily potable small screen. In addition, with the spread and high-quality image of digital still cameras, it is strongly desired to display photographed digital image data in high quality. Toshiba Corp., by low temperature polysilicone (p-Si) technology, commercialized the liquid crystal display series of 200 ppi (pixels per inch) precision dealing with the rise of the high-precision high-image quality LCD market. The super high precision of 200 ppi enables the display of smooth beautiful animation comparable to printed sheets of magazines and photographs. The display series are suitable for the display of various information services such as electronic books and electronic photo-viewers including internet. The screen sizes lined up are No. 4 type VGA (640x480 pixels) of a small pocket notebook size and No. 6.3 type XGA (1,024x768 pixels) of a paperback size, with a larger screen to be furthered. (translated by NEDO)

  3. Superhigh-resolution 200ppi series TFT-LCDs; Chokoseisai 200ppi ekisho display series

    Energy Technology Data Exchange (ETDEWEB)

    Kawamata, K.; Hirai, H. [Toshiba Corp., Tokyo (Japan)

    2000-02-01

    We have developed a 202 pixels per inch (ppi) thin-film transistor liquid crystal display (TFT-LCD) using low-temperature polycrystalline silicon (LTPS) technology. The superhigh resolution of 202 ppi offers the same image quality as printed matter such as magazines. The 200 ppi series TFT-LCDs are expected to support further developments in such areas as electronic books (e-books) and personal digital-picture viewers. Our lineup of 200 ppi TFT-LCDs includes a 4-inch display with VGA resolution, which is suitable for palmtop-size applications, and a 6.3-inch display with XGA resolution, which is suitable for typical photograph or paperback book-size applications. Larger size LCDs with 200 ppi resolution will be developed. (author)

  4. High luminance LCD projection TV, 40ZIP; Kokido ekisho projection terebi 40ZIP

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1999-03-01

    A 40 type LCD projection TV was commercialized which utilized the characteristics of a `large screen`, `saved space` and `light weight` incident to an LCD projection system and which succeeded `a television benign to people`, the concept of a flat wide television FACE{sub TM}. The main features are as follows:(1) A bright-in-every-corner and high-definition picture realized by employing a 2.7 type low temperature polysilicon LCD panel, high performance optical unit, wide angle of visibility, and high contrast screen. (2) A slim design for a 40 type large screen (compared with conventional models at Toshiba) having a depth comparable to that of 14 type and a mass equivalent to that of 25 type.(3) A PC input terminal most suitable for presentation. (translated by NEDO)

  5. 3D-image theater system using TLP770J LCD data projector; Ekisho data projector wo mochiita rittai eizo theater system

    Energy Technology Data Exchange (ETDEWEB)

    Kawasato, H. [Toshiba Corp., Tokyo (Japan)

    2000-02-01

    In today's multimedia era, visual systems are widely used not only for two-dimensional images but also for the depiction of virtual reality and for simulated three-dimensional images. At the same time, the projection technology used in large-screen projectors is shifting from the cathode ray tube (CRT) to the liquid crystal display (LCD). Toshiba has developed a simplified 3D-image theater system using the TLP770J LCD data projector, which offers easy maintenance and lower costs. (author)

  6. Fiscal 2000 research achievement report on the pioneering research and development involving next-generation liquid crystal process base technologies; 2000 nendo jisedai ekisho process kiban gijutsu ni kakawaru sendo kenkyu kaihatsu seika hokokusho

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2001-03-01

    For the enhancement of energy conservation in the liquid crystal display manufacturing process, activities are conducted in the three fields of (1) low temperature thin film fabrication technology, (2) zone-selective thin film growth technology, and (3) next-generation liquid crystal process base technology and comprehensive surveys. Conducted in field (1) are pioneering studies of low temperature high quality Si film fabrication by electromagnetic annealing, low temperature high quality thin film fabrication by EPA (electron plasma annealing), and low temperature normal pressure film fabrication. Conducted in field (2) are pioneering studies of zone-selective fabrication of high quality Si crystal film, high precision control of reforming (doping), and free pattern low resistance wiring fabrication. Conducted in field (3) are tentative fabrication, evaluation, and analysis of ultimate performance TFTs (thin film transistors) produced by the state-of-the-art purification enhancement technology; next-generation liquid crystal process; and surveys of functional thin film to be a novel material for substrates. In the pioneering study of low temperature high quality Si film fabrication by means of electromagnetic annealing, microwave annealing is studied as an energy efficient process to replace the currently favored ELA (excimer laser annealing) method, and then it is proved that the microwave annealing method is much higher in energy efficiency than the ELA method. (NEDO)

  7. FY 1999 Report on feasibility research and development for next generation liquid crystal process basic technologies; 1999 nendo jisedai ekisho process kiban gijutsu ni kakawaru sendo kenkyu kaihatsu seika hokokusho

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2000-03-01

    Described herein are the FY 1999 results of the feasibility study on the next generation liquid crystal processes. Technology for low-temperature thin film formation fabricates high-purity, high-density Si films useful as the laser annealing (crystallization) precursor by the IBD method, without using thermal annealing. Formation of thin films of a-Si and SiNx on substrates kept at 200 degrees C or lower is studied using a high-density plasma source, and the surface conditions are uniformly controlled over a large area of the film precursor. The new technology needs less power to produce the film than the conventional CVD method which uses parallel flat plates by controlling the plasma-generating region. Resources- and energy-saving using the TFT method are essential for production of liquid-crystal displays, and the techniques for forming the thin films at low temperature are studied. Reduction in wiring resistance (signal transmission delay) is studied for the next generation TFT, and it is found that the Cu film is selectively formed on TiN but not on SiO{sub 2} by the MOCVD method at 150 to 180 degrees C. Similarly, the selective film formation is confirmed in the plating technology. The comprehensive investigations for the next generation liquid crystal process technologies cover high-quality polycrystalline Si films and lithography (exposed to light). (NEDO)

  8. FY 1999 Report on research and development of energy utilization rationalization superhigh-technological liquid crystal technologies. Superhigh-technological electronic technology development promotion project for new functional electronic material design, control and analysis technologies; 1999 nendo energy shiyo gorika chosentan ekisho gijutsu kaihatsu seika hokokusho. Chosentan denshi gijutsu kaihatsu sokushin jigyo shinkino denshi zairyo sekkei seigyo bunseki nado gijutsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2000-04-01

    Described herein are the FY 1999 results of the liquid crystal technology development project. For the researches on multi-layer reflection, composite panels of flattened resins of different refractive index are developed to improve 2-layer monochromic contrast ratio. The guest/host liquid crystal compositions of high orientation order are investigated as the those useful for high contrast. Compounds are pursued for superanisotropic light absorption, and modification with a substituent is found to be effective. Molecular orientation controlling is also studied. For researches on memory-sustaining type liquid crystals, the studied items include formation of thin ferroelectric films on glass substrates, improvement of voltage-sustaining characteristics by composites (including compounds), and doping of trace quantities of ionic impurities. For development of image element colors, the studied items include multi-lattice-structured, oriented HPDLC devices, composites of high birefringence (high order light scattering), and light interference, high order light scattering type light control devices. The multi-dimensionally anisotropic structure of configuration divided into 3 parts of R, G and B is developed to create directive reflection which improves brightness of the reflection type color liquid crystal. A group of compounds are pursued to develop liquid crystal compositions of high refractive index anisotropy, and promising ones are found. The results of the comprehensive investigations are also described. (NEDO)

  9. Fiscal 2000 research achievement report on the development of super-advanced liquid crystal technology for energy use rationalization. Development promotion project for super-advanced electronic technology - Design, control, analysis, etc., of electronic materials having novel functions; 2000 nendo energy shiyo gorika chosentan ekisho gijutsu kaihatsu seika hokokusho. Chosentan denshi gijutsu kaihatsu sokushin jigyo (shinkino denshi zairyo sekkei seigyo bunseki nado gijutsu)

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2001-04-01

    Efforts are focused on the verification of target devices under the respective subjects, and activities are conducted with the development system reinforced. Three newly proposed reflection type liquid crystal devices achieve the target specifications of a reflection factor of 60% or higher and a contrast ratio of 15:1 or higher. Studies are conducted involving the five fields of (1) multilayer reflection devices, (2) memory retention liquid crystal devices, (3) single pixel color devices, (4) directional reflection devices, and (5) joint research. Research and development in field (1) covers ultra-anisotropic optical materials, ultrahigh reliability host liquid crystal materials for guest-host liquid crystals - mixed system, low voltage driven/high load holding liquid crystal compound systems, and new liquid crystal molecule orientation control technology; in field (2), low temperature fabrication of ferroelectric thin film, and ultrahigh purity high reliability liquid crystal compounds; in field (3), materials capable of controlling optical interference and higher order light scattering, photoregulation devices, highly birefringent liquid crystal materials - mixed system, and ultrahigh efficiency light scattering liquid crystal compounds; and, in field (4), multi-dimensional anisotropic structure fabrication technology and ultra-anisotropic optical materials. (NEDO)

  10. FY 1998 research result report. Ultra-high liquid crystal technology development for energy use rationalization (Technology of design/control/analysis of new functional electronic materials of the ultra-high electronic technology development promotion project); 1998 nendo kenkyu seika hokokusho. Energy shiyo gorika chosentan ekisho gijutsu kaihatsu (chosentan denshi gijutsu kaihatsu sokushin jigyo shinkino denshi zairyo sekkei seigyo bunseki nado gijutsu)

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1999-05-01

    Element technology is studied to realize a reflective-type, full-color, and high-resolution liquid crystal display for super-low power consumption data display. As to the functional compound microstructure formation technology, a 4-inch panel was trially fabricated using two-layer guest-host liquid crystal technology to achieve the desired display performance by control of molecular orientation. Further, holographic PDLC elements were favorably test-fabricated. A ferroelectric PZT thin layer was formed by forming layer at low temperature at which a glass substrate can be used. Optical interference/optical dispersion type optical control materials were studied by liquid crystal/polymer composition. Also studied were super-pure/super-reliable liquid crystal compound/liquid crystal composite systems and super-anisotropic liquid crystal compound by modeling ionic impurities and liquid crystal molecular interaction. In relation to the control technology of optical reflection characteristics, effects of liquid crystal molecular structures (derivative effect and copolymer composition) on orientation were elucidated. As to the technology to form multi-dimensional anisotropic structures, efforts were made for the heightening of formation technology of simple RGB (red, green, blue) directional reflection layers using acrylate materials. The paper also outlined the comprehensive survey. (NEDO)

  11. Fiscal 1997 report on the development of an energy use rationalization ultra-high tech liquid crystal technology. Project of development/promotion of ultra-high tech electronic technology / technology of design/control/analysis of new functional electronic materials; 1997 nendo kenkyu seika hokokusho energy shiyo gorika chosentan ekisho gijutsu kaihatsu. Chosentan denshi gijutsu kaihatsu sokushin jigyo / shinkino denshi zairyo sekkei seigyo bunseki gijutsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1998-05-01

    A research was conducted with the aim of developing an ultra-low power consuming type information display which supports the next next generation informatizing society. As to the function combined type fine structure formation technology, a formation technology of fine structure supporting multi-layer pixel by organic polymer materials was established to confirm a possibility of adopting it to high functional liquid crystal display. Concerning the high functional fine structure formation technology, a study was proceeded with on holographic PDLC which is an interference reflection coloring method. In relation to the low temperature film formation technology of ferroelectric thin films, a film formation device was introduced to obtain basic data, and at the same time a possibility was studied of improving film characteristics by laser annealing conducted after the film formation. Moreover, concerning the new functional material technology, studies were made of optical interference/high light-scattering control materials, light alignment elements, ultra-high purity/ultra-reliable optical materials, ultra-anisotropy optical materials, etc. About the light reflection characteristics control technology, studied were new liquid crystal molucular orientaion control technology, multi-dimensional anisotropy structure formation technology, etc. 100 refs., 273 figs., 58 tabs.