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Sample records for gaas schottky radiation

  1. Analysis of noise spectra in GaAs and GaN Schottky barrier diodes

    International Nuclear Information System (INIS)

    Pardo, D; Grajal, J; Mencía, B; Pérez, S; Mateos, J; González, T

    2011-01-01

    The Monte Carlo method is applied in this paper to characterize the noise spectra of GaAs and GaN Schottky barrier diodes operating under static and time varying conditions. We show the influence of the structure of the diode and working regimes on the noise spectrum of the diodes. Besides, the paper evaluates the capabilities of published analytical models to describe the noise spectra in Schottky diodes under time varying conditions. This is a further step toward the development of a design tool that integrates both the electrical response and the intrinsic noise generated in the devices

  2. GaAs detectors with an ultra-thin Schottky contact for spectrometry of charged particles

    Energy Technology Data Exchange (ETDEWEB)

    Chernykh, S.V., E-mail: chsv_84@mail.ru [National University of Science and Technology “MISIS”, Moscow (Russian Federation); Research Institute of Experimental and Theoretical Physics, Almaty (Kazakhstan); Chernykh, A.V. [National University of Science and Technology “MISIS”, Moscow (Russian Federation); Didenko, S.I.; Baryshnikov, F.M. [National University of Science and Technology “MISIS”, Moscow (Russian Federation); Research Institute of Experimental and Theoretical Physics, Almaty (Kazakhstan); Burtebayev, N. [Research Institute of Experimental and Theoretical Physics, Almaty (Kazakhstan); Institute of Nuclear Physics, Almaty (Kazakhstan); Britvich, G.I. [Institute of High Energy Physics, Protvino, Moscow region (Russian Federation); Chubenko, A.P. [Research Institute of Experimental and Theoretical Physics, Almaty (Kazakhstan); P.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow (Russian Federation); Guly, V.G.; Glybin, Yu.N. [LLC “SNIIP Plus”, Moscow (Russian Federation); Zholdybayev, T.K.; Burtebayeva, J.T.; Nassurlla, M. [Research Institute of Experimental and Theoretical Physics, Almaty (Kazakhstan); Institute of Nuclear Physics, Almaty (Kazakhstan)

    2017-02-11

    For the first time, samples of particle detectors based on high-purity GaAs epilayers with an active area of 25 and 80 mm{sup 2} and an ultra-thin Pt Schottky barrier were fabricated for use in the spectrometry of charged particles and their operating characteristics were studied. The obtained FWHM of 14.2 (for 25 mm{sup 2} detector) and 15.5 keV (for 80 mm{sup 2} detector) on the 5.499 MeV line of {sup 238}Pu is at the level of silicon spectrometric detectors. It was found that the main component that determines the energy resolution of the detector is a fluctuation in the number of collected electron–hole pairs. This allows us to state that the obtained energy resolution is close to the limit for VPE GaAs. - Highlights: • VPE GaAs particle detectors with an active area of 25 and 80 mm{sup 2} were fabricated. • 120 Å ultra-thin Pt Schottky barrier was used as a rectifying contact. • The obtained FWHM of 14.2 keV ({sup 238}Pu) is at the level of Si spectrometric detectors. • Various components of the total energy resolution were analyzed. • It was shown that obtained energy resolution is close to its limit for VPE GaAs.

  3. A comprehensive study of cryogenic cooled millimeter-wave frequency multipliers based on GaAs Schottky-barrier varactors

    DEFF Research Database (Denmark)

    Johansen, Tom Keinicke; Rybalko, Oleksandr; Zhurbenko, Vitaliy

    2018-01-01

    The benefit of cryogenic cooling on the performance of millimeter-wave GaAs Schottky-barrier varactor-based frequency multipliers has been studied. For this purpose, a dedicated compact model of a GaAs Schottky-barrier varactor using a triple-anode diode stack has been developed for use with a co......The benefit of cryogenic cooling on the performance of millimeter-wave GaAs Schottky-barrier varactor-based frequency multipliers has been studied. For this purpose, a dedicated compact model of a GaAs Schottky-barrier varactor using a triple-anode diode stack has been developed for use...... with a commercial RF and microwave CAD tool. The model implements critical physical phenomena such as thermionic-field emission current transport at cryogenic temperatures, temperature dependent mobility, reverse breakdown, self-heating, and high-field velocity saturation effects. A parallel conduction model...... is employed in order to include the effect of barrier inhomogeneities which is known to cause deviation from the expected I--V characteristics at cryogenic temperatures. The developed model is shown to accurately fit the I--V --T dataset from 25 to 295 K measured on the varactor diode stack. Harmonic balance...

  4. Large area, low capacitance, GaAs nanowire photodetector with a transparent Schottky collecting junction

    Energy Technology Data Exchange (ETDEWEB)

    Seyedi, M. A., E-mail: seyedi@usc.edu; Yao, M.; O' Brien, J.; Dapkus, P. D. [Center for Energy Nanoscience, University of Southern California, Los Angeles, California 90089 (United States); Wang, S. Y. [Center for Energy Nanoscience, University of Southern California, Los Angeles, California 90089 (United States); Nanostructured Energy Conversion Technology and Research (NECTAR), Advanced Studies Laboratories, University of California, Santa Cruz, California 95064, USA and NASA Ames Research Center, Moffett Field, California 94035 (United States)

    2013-12-16

    We present experimental results on a GaAs/Indium-Tin-Oxide Schottky-like heterojunction photodetector based on a nanowire device geometry. By distributing the active detecting area over an array of nanowires, it is possible to achieve large area detection with low capacitance. Devices with bare GaAs and passivated AlGaAs/GaAs nanowires are fabricated to compare the responsivity with and without surface passivation. We are able to achieve responsivity of >0.5A/W and Signal-Noise-Ratio in excess of 7 dB for 2 V applied reverse bias with passivated nanowire devices. Capacitance-voltage measurement yields <5 nF/cm{sup 2}, which shows a strong possibility for high-speed applications with a broad area device.

  5. Electron transport in nanometer GaAs structure under radiation exposure

    CERN Document Server

    Demarina, N V

    2002-01-01

    One investigates into effect of neutron and proton irradiation on electron transport in nanometer GaAs structures. Mathematical model takes account of radiation defects via introduction of additional mechanisms od scattering of carriers at point defects and disordered regions. To investigate experimentally into volt-ampere and volt-farad characteristics one used a structure based on a field-effect transistor with the Schottky gate and a built-in channel. Calculation results of electron mobility, drift rate of electrons, time of energy relaxation and electron pulse are compared with the experimental data

  6. 3-D GaAs radiation detectors

    CERN Document Server

    Meikle, A R; Ledingham, Kenneth W D; Marsh, J H; Mathieson, K; O'Shea, V; Smith, K M

    2002-01-01

    A novel type of GaAs radiation detector featuring a 3-D array of electrodes that penetrate through the detector bulk is described. The development of the technology to fabricate such a detector is presented along with electrical and radiation source tests. Simulations of the electrical characteristics are given for detectors of various dimensions. Laser drilling, wet chemical etching and metal evaporation were used to create a cell array of nine electrodes, each with a diameter of 60 mu m and a pitch of 210 mu m. Electrical measurements showed I-V characteristics with low leakage currents and high breakdown voltages. The forward and reverse I-V measurements showed asymmetrical characteristics, which are not seen in planar diodes. Spectra were obtained using alpha particle illumination. A charge collection efficiency of 50% and a S/N ratio of 3 : 1 were obtained. Simulations using the MEDICI software package were performed on cells with various dimensions and were comparable with experimental results. Simulati...

  7. 3-D GaAs radiation detectors

    International Nuclear Information System (INIS)

    Meikle, A.R.; Bates, R.L.; Ledingham, K.; Marsh, J.H.; Mathieson, K.; O'Shea, V.; Smith, K.M.

    2002-01-01

    A novel type of GaAs radiation detector featuring a 3-D array of electrodes that penetrate through the detector bulk is described. The development of the technology to fabricate such a detector is presented along with electrical and radiation source tests. Simulations of the electrical characteristics are given for detectors of various dimensions. Laser drilling, wet chemical etching and metal evaporation were used to create a cell array of nine electrodes, each with a diameter of 60 μm and a pitch of 210 μm. Electrical measurements showed I-V characteristics with low leakage currents and high breakdown voltages. The forward and reverse I-V measurements showed asymmetrical characteristics, which are not seen in planar diodes. Spectra were obtained using alpha particle illumination. A charge collection efficiency of 50% and a S/N ratio of 3 : 1 were obtained. Simulations using the MEDICI software package were performed on cells with various dimensions and were comparable with experimental results. Simulations of a nine-electrode cell with 10 μm electrodes with a 25 μm pitch were also performed. The I-V characteristics again showed a high breakdown voltage with a low leakage current but also showed a full depletion voltage of just 8 V

  8. The determination of electronic and interface state density distributions of Au/n-type GaAs Schottky barrier diodes

    Energy Technology Data Exchange (ETDEWEB)

    Karatas, S. [Faculty of Sciences and Arts, Department of Physics, University of Kahramanmaras Suetcue Imam, 46100 Kahramanmaras (Turkey)]. E-mail: skaratas@ksu.edu.tr; Tueruet, A. [Faculty of Sciences and Arts, Department of Physics, Atatuerk University, 25240 Erzurum (Turkey)

    2006-05-31

    The electronic and interface state density distribution properties obtained from current-voltage (I-V) and capacitance-voltage (C-V) characteristics of Au/n-type GaAs Schottky barrier diode (SBD) at room temperature was investigated. SBD parameters such as ideality factor (n), series resistance (R {sub S}) and barrier height ({phi}{sub IV} ) were obtained from I-V and C-V measurements using Cheung's method. The diode parameters such as ideality factor, series resistance and barrier heights were found as 1.51-1.78, 7.597-8.167 {omega} and 0.88-1.14 eV, respectively. The diode shows non-ideal I-V behaviour with an ideality factor greater than unity. Furthermore, the energy distribution of interface state density was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. The results show the presence of thin interfacial layer between the metal and semiconductor.

  9. Ambipolarity reduction in DMG asymmetric vacuum dielectric Schottky Barrier GAA MOSFET to improve hot carrier reliability

    Science.gov (United States)

    Kumar, Manoj; Haldar, Subhasis; Gupta, Mridula; Gupta, R. S.

    2017-11-01

    An explicit surface potential and subthreshold current model for novel Dual Metal Gate (DMG) Asymmetric Vacuum (AV) as gate dielectric Schottky Barrier (SB) Cylindrical Gate All Around (CGAA) MOSFET with the incorporation of localized charges (Nf) is developed to provide excellent immunity against threshold voltage (Vth) degradation due to hot carriers. Hot carrier induced Localized Charges (LC) either positive or negative leads to degrade the threshold of the device. The major advantage of the proposed DMG-AV-SB-CGAA MOSFET is that it mitigates the ambipolar behavior thus offering very good on current to off current ratio; and also reduces the electron temperature which leads to less hot carrier generation thus lesser degradation in Vth and improved Hot Carrier reliability. The surface potential is determined for three different regions by solving 1-D Poisson's and 2-D Laplace equation through separation of variable method to facilitate an optimal model for calculating the subthreshold drain current from Si-SiO2 interface boundary. The developed model results are in good agreement with that of ATLAS-TCAD simulation.

  10. Radiation effects in pigtailed GaAs and GaA1As LEDs

    International Nuclear Information System (INIS)

    Barnes, C.E.

    1981-06-01

    Permanent and transient radiation effects have been studied in Plessey pigtailed, high radiance GaAs and GaAlAs LEDs using neutron, gamma ray and X-ray sources. The radiation-induced source of degradation in these devices was determined by also examining both bare, unpigtailed LEDs and separate samples of the Corning fibers used as pigtails. No transient effects were observed in the unpigtailed LEDs during either pulsed neutron or X-ray exposure. In contrast, the Corning doped silica fibers exhibited strong transient attenuation following pulsed X-ray bombardment. Permanent neutron damage in these pigtailed LEDs consisted essentially of light output degradation in the LED itself. Permanent gamma ray effects due to a Co-60 irradiation of 1 megarad were restricted to a small increase in attenuation in the fiber. The two primary radiation effects were then transient attenuation in the fiber pigtail and permanent neutron-induced degradation of the LED

  11. Fabrication and Characterization of Planar Dipole Antenna Integrated with GaAs Based-Schottky Diode for On-chip Electronic Device Application

    Energy Technology Data Exchange (ETDEWEB)

    Mustafa, Farahiyah; Hashim, Abdul Manaf; Parimon, Norfarariyanti; Rahman, Shaharin Fadzli Abd; Rahman, Abdul Rahim Abdul [Material Innovations and Nanoelectronics Research Group, Faculty of Electrical Engineering, Universiti Teknologi Malaysia, 81310 Skudai, Johor (Malaysia); Osman, Mohd Nizam [Telekom Research and Development, TM Innovation Centre, 63000 Cyberjaya (Malaysia); Aziz, Azlan Abdul; Hashim, Md Roslan, E-mail: manaf@fke.utm.my [Nano-Optoelectronics Research, Faculty of Physics, Universiti Sains Malaysia, 11800 Minden, Penang (Malaysia)

    2011-02-15

    The design and RF characteristics of planar dipole antennas facilitated with coplanar waveguide (CPW) structure on semi-insulated GaAs are performed and confirmed to work in super high frequency (SHF) range. As expected, the fundamental resonant frequency shifts to higher frequency when the length of antenna decreases. Interestingly, the resonant frequencies of antenna are almost unchanged with the variation of antenna width and metal thickness. It is shown experimentally that return loss down to -54 dB with a metal thickness of 50 nm is obtainable. Preliminary investigation on design, fabrication, and DC and RF characteristics of the integrated device (planar dipole antenna + Schottky diode) on AlGaAs/GaAs HEMT structure is presented. From the preliminary direct irradiation experiments using the integrated device, the Schottky diode is not turned on due to weak reception of RF signal by dipole antenna. Further extensive considerations on the polarization of irradiation etc. need to be carried out in order to improve the signal reception. These preliminary results provide a new breakthrough for on-chip electronic device application in nanosystems.

  12. Dependence of the conductivity on the active-region thickness in GaAs thin-film Schottky diodes

    Energy Technology Data Exchange (ETDEWEB)

    Zuev, S. A., E-mail: sazuev@yandex.ru; Kilessa, G. V.; Asanov, E. E.; Starostenko, V. V.; Pokrova, S. V. [Vernadsky Crimean Federal University (Russian Federation)

    2016-06-15

    The dependences of the electrical characteristics of thin-film structures with Schottky barrier on gallium arsenide are studied using Monte Carlo numerical simulation in the kinetic approximation with the main scattering mechanisms taken into account. The dependences of the diode conductivity on the voltage and channel thickness are obtained. It is shown that the relation between the diode voltage and conductivity changes at a small channel thickness, which is explained by barrier field expulsion to the substrate.

  13. Analysis of I-V characteristics on Au/n-type GaAs Schottky structures in wide temperature range

    Energy Technology Data Exchange (ETDEWEB)

    Karatas, S. [Department of Physics, Faculty of Sciences and Arts, University of Kahramanmaras Suetcue Imam, Kahramanmaras 46100 (Turkey)]. E-mail: skaratas@ksu.edu.tr; Altindal, S. [Department of Physics, Faculty of Sciences and Arts, Gazi University, 06500 Besevler, Ankara (Turkey)

    2005-09-15

    The current-voltage (I-V) characteristics of Au/n-GaAs Schottky barrier diodes (SBD) were determined in the temperature range 80-400K. SBD parameters such as ideality factor n, series resistance R{sub S} and barrier height {phi}{sub b} were extracted from I-V curves using Cheung's method. The barrier height for current transport decreases and the ideality factor increases with the decrease temperatures. Such behavior is attributed to barrier inhomogeneities by assuming a Gaussian distribution of barrier heights at the interface. So that barrier height {phi}{sub I-V} have been corrected by taking into account quality factors (n) and the electron tunneling factor ({alpha}{chi}{sup 1/2}{delta}) in the expression of saturation current (I{sub 0}) of the Au/n-GaAs Schottky diodes. Thus, a modified ln(I{sub 0}/T{sup 2})-q{sup 2}{sigma}{sub 0}{sup 2}/2k{sup 2}T{sup 2} versus 1/T gives {phi}-bar {sub b0}(T=0) and A{sup *} as 0.73eV and 11.08A/(cm{sup 2}K{sup 2}), respectively, without using the temperature coefficient of the barrier heights. Therefore, it has been concluded that the temperature dependent I-V characteristics of the device can be successfully explained with Gaussian distribution of the BHs.

  14. GaAs quantum dot solar cell under concentrated radiation

    International Nuclear Information System (INIS)

    Sablon, K.; Little, J. W.; Hier, H.; Li, Y.; Mitin, V.; Vagidov, N.; Sergeev, A.

    2015-01-01

    Effects of concentrated solar radiation on photovoltaic performance are investigated in well-developed GaAs quantum dot (QD) solar cells with 1-Sun efficiencies of 18%–19%. In these devices, the conversion processes are enhanced by nanoscale potential barriers and/or AlGaAs atomically thin barriers around QDs, which prevent photoelectron capture to QDs. Under concentrated radiation, the short circuit current increases proportionally to the concentration and the open circuit voltage shows the logarithmic increase. In the range up to hundred Suns, the contributions of QDs to the photocurrent are proportional to the light concentration. The ideality factors of 1.1–1.3 found from the V OC -Sun characteristics demonstrate effective suppression of recombination processes in barrier-separated QDs. The conversion efficiency shows the wide maximum in the range of 40–90 Suns and reaches 21.6%. Detailed analysis of I-V-Sun characteristics shows that at low intensities, the series resistance decreases inversely proportional to the concentration and, at ∼40 Suns, reaches the plateau determined mainly by the front contact resistance. Improvement of contact resistance would increase efficiency to above 24% at thousand Suns

  15. The current–voltage and capacitance–voltage characteristics at high temperatures of Au Schottky contact to n-type GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Özerli, Halil; Karteri, İbrahim [Department of Materials Science And Engineering, Kahramanmaraş Sütçü İmam University, 46100 Kahramanmaraş (Turkey); Karataş, Şükrü, E-mail: skaratas@ksu.edu.tr [Department of Materials Science And Engineering, Kahramanmaraş Sütçü İmam University, 46100 Kahramanmaraş (Turkey); Department of Physics, Kahramanmaraş Sütçü İmam University, 46100 Kahramanmaraş (Turkey); Altindal, Şemsettin [Department of Physics, Gazi University, 06100 Ankara (Turkey)

    2014-05-01

    Highlights: • The electronic parameters of the diode under temperature were investigated. • The barrier heights have a Gaussian distribution. • Au/n-GaAs diode exhibits a rectification behavior. - Abstract: We have investigated the temperature-dependent current–voltage (I–V) and capacitance–voltage (C–V) characteristics of Au/n-GaAs Schottky barrier diodes (SBDs) in the temperature range of 280–415 K. The barrier height for the Au/n-type GaAs SBDs from the I–V and C–V characteristics have varied from 0.901 eV to 0.963 eV (I–V) and 1.234 eV to 0.967 eV (C–V), and the ideality factor (n) from 1.45 to 1.69 in the temperature range 280–415 K. The conventional Richardson plots are found to be linear in the temperature range measured. Both the ln(I{sub 0}/T{sup 2}) versus (kT){sup −1} and ln(I{sub 0}/T{sup 2}) versus (nkT){sup −1} plots gives a straight line corresponding to activation energies 0.773 eV and 0.870 eV, respectively. A Φ{sub b0} versus 1/T plot was drawn to obtain evidence of a Gaussian distribution of the BHs, and values of Φ{sup ¯}{sub b0} = 1.071 eV and σ{sub 0} = 0.094 V for the mean BH and zero-bias standard deviation have been obtained from this plot.

  16. The current–voltage and capacitance–voltage characteristics at high temperatures of Au Schottky contact to n-type GaAs

    International Nuclear Information System (INIS)

    Özerli, Halil; Karteri, İbrahim; Karataş, Şükrü; Altindal, Şemsettin

    2014-01-01

    Highlights: • The electronic parameters of the diode under temperature were investigated. • The barrier heights have a Gaussian distribution. • Au/n-GaAs diode exhibits a rectification behavior. - Abstract: We have investigated the temperature-dependent current–voltage (I–V) and capacitance–voltage (C–V) characteristics of Au/n-GaAs Schottky barrier diodes (SBDs) in the temperature range of 280–415 K. The barrier height for the Au/n-type GaAs SBDs from the I–V and C–V characteristics have varied from 0.901 eV to 0.963 eV (I–V) and 1.234 eV to 0.967 eV (C–V), and the ideality factor (n) from 1.45 to 1.69 in the temperature range 280–415 K. The conventional Richardson plots are found to be linear in the temperature range measured. Both the ln(I 0 /T 2 ) versus (kT) −1 and ln(I 0 /T 2 ) versus (nkT) −1 plots gives a straight line corresponding to activation energies 0.773 eV and 0.870 eV, respectively. A Φ b0 versus 1/T plot was drawn to obtain evidence of a Gaussian distribution of the BHs, and values of Φ ¯ b0 = 1.071 eV and σ 0 = 0.094 V for the mean BH and zero-bias standard deviation have been obtained from this plot

  17. Effect of radiation-induced emission of Schottky defects on the formation of colloids in alkali halides

    NARCIS (Netherlands)

    Dubinko, [No Value; Vainshtein, DI; Den Hartog, HW

    2003-01-01

    Formation of vacancy clusters in irradiated crystals is considered taking into account radiation-induced Schottky defect emission (RSDE) from extended defects. RSDE acts in the opposite direction compared with Frenkel pair production, and it results in the radiation-induced recovery processes. In

  18. Terahertz radiation from delta-doped GaAs

    DEFF Research Database (Denmark)

    Birkedal, Dan; Hansen, Ole; Sørensen, Claus Birger

    1994-01-01

    Terahertz pulse emission from four different delta-doped molecular beam epitaxially grown GaAs samples is studied. We observe a decrease of the emitted THz pulse amplitude as the distance of the delta-doped layer from the surface is increased, and a change in polarity of the THz pulses as compare...

  19. Radiation damage study of GaAs detectors irradiated by fast neutrons

    Czech Academy of Sciences Publication Activity Database

    Linhart, V.; Bém, Pavel; Götz, Miloslav; Honusek, Milan; Mareš, Jiří J.; Slavíček, T.; Sopko, B.; Šimečková, Eva

    2006-01-01

    Roč. 563, č. 1 (2006), s. 66-69 ISSN 0168-9002 R&D Projects: GA MPO(CZ) 1H-PK/07 Institutional research plan: CEZ:AV0Z10480505; CEZ:AV0Z10100521 Keywords : GaAs high-field mobility * radiation damage * solid-state detectors Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.185, year: 2006

  20. Nonlinear absorption coefficient and relative refraction index change for an asymmetrical double δ-doped quantum well in GaAs with a Schottky barrier potential

    Energy Technology Data Exchange (ETDEWEB)

    Rojas-Briseño, J.G.; Martínez-Orozco, J.C.; Rodríguez-Vargas, I. [Unidad Académica de Física, Universidad Autónoma de Zacatecas, Calzada Solidaridad esquina con Paseo la Bufa S/N, C.P. 98060, Zacatecas, Zac. (Mexico); Mora-Ramos, M.E. [Facultad de Ciencias, Universidad Autónoma del Estado de Morelos, Av. Universidad 1001, CP 62209, Cuernavaca, Morelos (Mexico); Instituto de Física, Universidad de Antioquia, AA 1226, Medellín (Colombia); Duque, C.A., E-mail: cduque@fisica.udea.edu.co [Instituto de Física, Universidad de Antioquia, AA 1226, Medellín (Colombia)

    2013-09-01

    In this work we are reporting the energy level spectrum for a quantum system consisting of an n-type double δ-doped quantum well with a Schottky barrier potential in a Gallium Arsenide matrix. The calculated states are taken as the basis for the evaluation of the linear and third-order nonlinear contributions to the optical absorption coefficient and to the relative refractive index change, making particular use of the asymmetry of the potential profile. These optical properties are then reported as a function of the Schottky barrier height (SBH) and the separation distance between the δ-doped quantum wells. Also, the effects of the application of hydrostatic pressure are studied. The results show that the amplitudes of the resonant peaks are of the same order of magnitude of those obtained in the case of single δ-doped field effect transistors; but tailoring the asymmetry of the confining potential profile allows the control the resonant peak positions.

  1. Effects of the TiO2 high-k insulator material on the electrical characteristics of GaAs based Schottky barrier diodes

    Science.gov (United States)

    Zellag, S.; Dehimi, L.; Asar, T.; Saadoune, A.; Fritah, A.; Özçelik, S.

    2018-01-01

    The effects of the TiO2 high-k insulator material on Au/n-GaAs/Ti/Au Schottky barrier diodes have been studied by means of the numerical simulation and experimental results at room temperature. The Atlas-Silvaco-TCAD numerical simulator has been used to explain the behavior of different physical phenomena of Schottky diode. The experimental values of ideality factor, barrier height, and series resistance have been determined by using the various techniques such as Cheung's method, forward bias ln I- V and reverse capacitance-voltage behaviors. The experimental ideality factor and barrier height values have been found to be 4.14 and 0.585 eV for Au/n-GaAs/Ti/Au Schottky barrier diode and 4.00 and 0.548 eV for that structure with 16 nm thick TiO2 film and 3.92, 0.556 eV with 100 nm thick TiO2 film. The diodes show a non-ideal current-voltage behavior that of the ideality factor so far from unity. The extraction of N ss interface distribution profile as a function of E c -E ss is made using forward-bias I- V measurement by considering the bias dependence of ideality factor, the effective barrier height, and series resistance for Schottky barrier diodes. The N ss calculated values with consideration of the series resistance are lower than the calculated ones without series resistance. The current-voltage results of diodes reveal an abnormal increase in leakage current with an increase in thickness of high-k interfacial insulator layer. However, the simulation agrees in general with the experimental results.

  2. Photochemical etching of GaAs using synchrotron radiation

    Energy Technology Data Exchange (ETDEWEB)

    Terakado, Shingo; Nishino, Jun-ichi; Morigami, Mitsuaki; Harada, Mitsuaki; Suzuki, Shigeo (SANYO Electric Co. Ltd., Tsukuba, Ibaraki (Japan). Tsukuba Research Center); Tanaka, Kenichiro; Chikawa, Jun-ichi

    1990-05-01

    The photochemical etching of gallium arsenide by chlorine was investigated using synchrotron radiation. At the substrate temperatures above 25degC, both the irradiated and nonirradiated regions were uniformly etched. In case of substrate temperatures below -25degC, highly selective etching was observed in the irradiated region. We considered that at low temperatures, etching reaction caused by gas-phase excitation is suppressed and photochemical surface reaction becomes dominant. (author).

  3. A simple model of space radiation damage in GaAs solar cells

    Science.gov (United States)

    Wilson, J. W.; Stith, J. J.; Stock, L. V.

    1983-01-01

    A simple model is derived for the radiation damage of shallow junction gallium arsenide (GaAs) solar cells. Reasonable agreement is found between the model and specific experimental studies of radiation effects with electron and proton beams. In particular, the extreme sensitivity of the cell to protons stopping near the cell junction is predicted by the model. The equivalent fluence concept is of questionable validity for monoenergetic proton beams. Angular factors are quite important in establishing the cell sensitivity to incident particle types and energies. A fluence of isotropic incidence 1 MeV electrons (assuming infinite backing) is equivalent to four times the fluence of normal incidence 1 MeV electrons. Spectral factors common to the space radiations are considered, and cover glass thickness required to minimize the initial damage for a typical cell configuration is calculated. Rough equivalence between the geosynchronous environment and an equivalent 1 MeV electron fluence (normal incidence) is established.

  4. Modeling of Schottky Barrier Diode Millimeter-Wave Multipliers at Cryogenic Temperatures

    DEFF Research Database (Denmark)

    Johansen, Tom K.; Rybalko, Oleksandr; Zhurbenko, Vitaliy

    2015-01-01

    We report on the evaluation of Schottky barrier diode GaAs multipliers at cryogenic temperatures. A GaAs Schottky barrier diode model is developed for theoretical estimation of doubler performance. The model is used to predict efficiency of doublers from room to cryogenic temperatures. The theore...

  5. Terahertz-radiation generation and detection in low-temperature-grown GaAs epitaxial films on GaAs (100) and (111)A substrates

    Energy Technology Data Exchange (ETDEWEB)

    Galiev, G. B.; Pushkarev, S. S., E-mail: s-s-e-r-p@mail.ru [Russian Academy of Sciences, Institute of Ultrahigh-Frequency Semiconductor Electronics (Russian Federation); Buriakov, A. M.; Bilyk, V. R.; Mishina, E. D. [Moscow Technological University “MIREA” (Russian Federation); Klimov, E. A. [Russian Academy of Sciences, Institute of Ultrahigh-Frequency Semiconductor Electronics (Russian Federation); Vasil’evskii, I. S. [National Research Nuclear University “MEPhI” (Russian Federation); Maltsev, P. P. [Russian Academy of Sciences, Institute of Ultrahigh-Frequency Semiconductor Electronics (Russian Federation)

    2017-04-15

    The efficiency of the generation and detection of terahertz radiation in the range up to 3 THz by LT-GaAs films containing equidistant Si doping δ layers and grown by molecular beam epitaxy on GaAs (100) and (111)Ga substrates is studied by terahertz spectroscopy. Microstrip photoconductive antennas are fabricated on the film surface. Terahertz radiation is generated by exposure of the antenna gap to femtosecond optical laser pulses. It is shown that the intensity of terahertz radiation from the photoconductive antenna on LT-GaAs/GaAs (111)Ga is twice as large as the intensity of a similar antenna on LT-GaAs/GaAs(100) and the sensitivity of the antenna on LT-GaAs/GaAs (111)Ga as a terahertz-radiation detector exceeds that of the antenna on LT-GaAs/GaAs(100) by a factor of 1.4.

  6. Radiation-induced effects in GaAs thin-film optical (10.6 μm) waveguides

    International Nuclear Information System (INIS)

    Share, S.; Epstein, A.S.; Monse, T.; Chang, W.S.C.; Chang, M.S.

    1976-01-01

    Two types of GaAs thin-film optical waveguide structures operating at 10.6 μm were examined before and after exposure to neutron and γ irradiation. The attenuation rate of the GaAs/n + -GaAs structure was particularly sensitive to neutron irradiation of 10 13 cm -2 and exhibited postirradiation annealing at 150 0 C. This is in contrast to the relative neutron irradiation insensitivity of a GaAs/GaAs 1 /sub -//subx/P/subx//n + -GaAs structure. The effect of γ radiation is less pronounced for both structures. The radiation-induced changes are discussed in terms of free-carrier absorption, index of refraction, scattering centers, and absorption by complexes

  7. Intrinsic radiation tolerance of ultra-thin GaAs solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Hirst, L. C.; Yakes, M. K.; Warner, J. H.; Schmieder, K. J.; Walters, R. J.; Jenkins, P. P. [U.S. Naval Research Laboratory, 4555 Overlook Ave. SW., Washington, D.C. 20375 (United States); Bennett, M. F. [Sotera Defense Solutions, Inc., Annapolis Junction, Maryland 20701-1067 (United States)

    2016-07-18

    Radiation tolerance is a critical performance criterion of photovoltaic devices for space power applications. In this paper we demonstrate the intrinsic radiation tolerance of an ultra-thin solar cell geometry. Device characteristics of GaAs solar cells with absorber layer thicknesses 80 nm and 800 nm were compared before and after 3 MeV proton irradiation. Both cells showed a similar degradation in V{sub oc} with increasing fluence; however, the 80 nm cell showed no degradation in I{sub sc} for fluences up to 10{sup 14 }p{sup +} cm{sup −2}. For the same exposure, the I{sub sc} of the 800 nm cell had severely degraded leaving a remaining factor of 0.26.

  8. Radiation hardness of MSM biasing structures for GaAs microstrip detectors

    Energy Technology Data Exchange (ETDEWEB)

    Rente, C. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Arbabi, S. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Braunschweig, W. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Breibach, J. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Chu, Z. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Karpinski, W. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Krais, R. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Kubicki, T. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Luebelsmeyer, K. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Schoentag, M. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Siedling, R. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Syben, O. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Tenbusch, F. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Toporowski, M. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Wittmer, B. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Xiao, W.J. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.

    1997-04-01

    In order to achieve a high signal-to-noise ratio and a low-space consumption it is necessary to use integrated resistors for the biasing of GaAs microstrip detectors used in high-energy physics experiments (e.g. CMS, H1). Metal-semiconductor-metal (MSM) structures operating in the reach through regime seem to be a promising solution for that purpose. According to the requirements on radiation hardness of strip detectors to be used in the CMS experiment, we have irradiated MSM biasing structures with up to 4.6 x 10{sup 14} neutrons/cm{sup 2}. The radiation effects on the dc and noise characteristics of the devices are investigated. Furthermore, the effects of an annealing procedure are examined. (orig.).

  9. Semi-insulating LEC GaAs as a material for radiation detectors: materials science issues

    Energy Technology Data Exchange (ETDEWEB)

    Markov, A.V.; Mezhennyi, M.V.; Polyakov, A.Y. E-mail: polyakov@mail.girmet.ru; Smirnov, N.B.; Govorkov, A.V.; Eremin, V.K.; Verbitskaya, E.M.; Gavrin, V.N.; Kozlova, Y.P.; Veretenkin, Y.P.; Bowles, T.J

    2001-06-21

    Semi-insulating (SI) GaAs is now being reconsidered as a promising material for radiation detectors, mostly due to greatly improved quality of the material. In this paper we shall describe the properties of the state-of-the-art SI GaAs crystals grown by LEC method as relevant for such applications. Specifically, we shall concentrate on the assessment of the spectra and density of residual impurities, on the measurements of deep levels spectra and on studying the impact of these centers on material parameters. The spectra of deep centers as studied by PICTS and DLTS indicate that, in LEC crystals grown from stoichiometric melts, besides the most prominent EL2 center, other electron and hole traps are usually observed. By comparing the DLTS and PICTS results we show that PICTS often tends to overestimate the relative contributions of traps shallower than EL2. Two approaches to decreasing EL2 concentration in LEC grown crystals have been proposed in literature: to grow crystals from Ga-rich melts and to anneal the material at high temperatures. We have studied the changes in deep level spectra and transport parameters for both cases. In annealing experiments the possibility of thick samples modification by arsenic diffusion was also investigated.

  10. Effects of dry etching on GaAs

    International Nuclear Information System (INIS)

    Pang, S.W.; Lincoln, G.A.; McClelland, R.W.; DeGraff, P.D.; Geis, M.W.; Piacentini, W.J.

    1983-01-01

    A number of dry etching techniques have been developed and their ability to produce anisotropic etch profiles has been demonstrated. In addition to etch anisotropy, an important consideration for device and circuit fabrication is whether a sample suffers radiation damage by exposure to ions, electrons, or ultraviolet light during etching. In this study we evaluate the degree of radiation damage induced in GaAs by ion-beam etching with Ar, reactive-ion etching with CF 4 and CHF 3 , and ion-beam-assisted etching with Ar and Cl 2 . In addition, we propose and demonstrate processing techniques which can be used after dry etching to reduce the effects of radiation damage. GaAs samples were etched under a variety of etching conditions. The degree of radiation damage caused by etching was determined by evaluating Schottky diodes fabricated on the etched surfaces and by using deep level transient spectroscopy to characterize trapping centers. It was found that the barrier heights and breakdown voltages of Schottky diodes were changed after etching. Also, an increase in the density of traps was observed. Variations in the etching conditions had a strong effect on the measured characteristics of the samples

  11. Fine structure of laser spectrum at electron-beam pumping based on radiation-modified optically homogeneous crystals of undoped GaAs

    Directory of Open Access Journals (Sweden)

    Garkavenko A. S.

    2011-11-01

    Full Text Available There was investigated the influence of excitation level and temperature on the radiation parameters of lasers based on n-type GaAs crystals with high optical homogeneity, modified with the use of radiotechnologies.

  12. Radiation-resistant photostructure for Schottky diode based on Cr/In2Hg3Te6

    Directory of Open Access Journals (Sweden)

    Ashcheulov A. A.

    2016-05-01

    Full Text Available Ge, Si, InGaAs, GaInAsP photodiodes are used as optical radiation receivers and function in a spectral range of transparency of quartz fiberglass. For the optical systems operated in the increased radioactivity the photodetectors' application on In2Hg3Te6 crystal base characterized by a photosensitivity in the spectral range of 0,5-1,6 mm and also by increased radiation resistance to alpha, beta and gamma radiation is most acceptable. Schottky photodiode structure was designed on the base of this semiconductor formed by a modified floating zone recrystallization technique where the sedimentation effect was leveled. It consists of n-In2Hg3Te6 substrate and deposited by cathode sputtering Cr barrier layer of thickness within a range 10-11 nm choice of Cr is determined by its optimal optical, electric and adhesive features in high quality radiation-resistant photodiode structures manufacturing. Indium and nichrome are used as ohmic contacts. The barrier structures have the contact area of 1,13 mm2 with photo response of 0,6-1,6 mm at the maximal sensitivity 0,43 A/W on the wavelength l,55 mm. Reverse dark current of these structures do not exceed 4 mA at the bias of 1 V (T=295 K, and the potential barrier height is equal to 0,41 eV. The tests of radiation resistance of these structures demonstrated their ability to function at doses of 2⋅108 rem without evident parameters changes. This allows using them in practical aims in the conditions of high radiation.

  13. Radiation hardness of n-type SiC Schottky barrier diodes irradiated with MeV He ion microbeam

    Energy Technology Data Exchange (ETDEWEB)

    Pastuović, Željko, E-mail: zkp@ansto.gov.au [Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232 (Australia); Capan, Ivana [Material Physics Division, Institute Rudjer Boskovic, PO Box 180, 10000 Zagreb (Croatia); Cohen, David D. [Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232 (Australia); Forneris, Jacopo [Physics Department and NIS Excellence Centre, University of Torino, via P. Giuria 1, 10125 Torino (Italy); Iwamoto, Naoya; Ohshima, Takeshi [Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan); Siegele, Rainer [Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232 (Australia); Hoshino, Norihiro; Tsuchida, Hidekazu [Central Research Institute of Electric Power Industry, 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196 (Japan)

    2015-04-01

    We studied the radiation hardness of 4H-SiC Schottky barrier diodes (SBD) for the light ion detection and spectroscopy in harsh radiation environments. n-Type SBD prepared on nitrogen-doped (∼4 × 10{sup 14} cm{sup −3}) epitaxial grown 4H-SiC thin wafers have been irradiated by a raster scanning alpha particle microbeam (2 and 4 MeV He{sup 2+} ions separately) in order to create patterned damage structures at different depths within a sensitive volume of tested diodes. Deep Level Transient Spectroscopy (DLTS) analysis revealed the formation of two deep electron traps in the irradiated and not thermally treated 4H-SiC within the ion implantation range (E1 and E2). The E2 state resembles the well-known Z{sub 1/2} center, while the E1 state could not be assigned to any particular defect reported in the literature. Ion Beam Induced Charge (IBIC) microscopy with multiple He ion probe microbeams (1–6 MeV) having different penetration depths in tested partly damaged 4H-SiC SBD has been used to determine the degradation of the charge collection efficiency (CCE) over a wide fluence range of damaging alpha particle. A non-linear behavior of the CCE decrease and a significant degradation of the spectroscopic performance with increasing He ion fluence were observed above the value of 10{sup 11} cm{sup −2}.

  14. Investigation of the radiation damage of GaAs detectors by neutrons and photons

    Science.gov (United States)

    Braunschweig, W.; Kubicki, Th.; Lübelsmeyer, K.; Pandoulas, D.; Syben, O.; Tenbusch, F.; Toporowsky, M.; Wilms, Th.; Wittmer, B.; Xiao, W. J.

    1996-02-01

    Surface barrier particle detectors, processed in Aachen using SI GaAs from several manufacturers, have been irradiated with neutrons (peak energy ˜1 MeV) up to fluences of 4.0 × 10 14 n/cm 2 and with photons from a 60Co source with a dose of 100 Mrad. All detectors work well after the irradiation. Detectors biased with 200 V during the neutron irradiation show no significant difference from those not biased. After irradiation with 4.0 × 10 14 n/cm 2 the leakage currents at 200 V are a factor of 4 greater than those before irradiation. At the highest radiation level the signal for minimum ionizing particles corresponds to 7200 electrons (at 200 V bias voltage) independent of peaking times between 40 ns and 2.2 μs. The signals for α-particles (2.2 μs peaking time, 200 V bias voltage) are about 20% of those before irradiation. The exposure to the 100 Mrad photon dose caused little change of the detector performance. The leakage currents were even reduced by about 10%.

  15. RADIATION PERFORMANCE OF GAN AND INAS/GAAS QUANTUM DOT BASED DEVICES SUBJECTED TO NEUTRON RADIATION

    Directory of Open Access Journals (Sweden)

    Dhiyauddin Ahmad Fauzi

    2017-05-01

    Full Text Available In addition to their useful optoelectronics functions, gallium nitride (GaN and quantum dots (QDs based structures are also known for their radiation hardness properties. With demands on such semiconductor material structures, it is important to investigate the differences in reliability and radiation hardness properties of these two devices. For this purpose, three sets of GaN light-emitting diode (LED and InAs/GaAs dot-in-a well (DWELL samples were irradiated with thermal neutron of fluence ranging from 3×1013 to 6×1014 neutron/cm2 in PUSPATI TRIGA research reactor. The radiation performances for each device were evaluated based on the current-voltage (I-V and capacitance-voltage (C-V electrical characterisation method. Results suggested that the GaN based sample is less susceptible to electrical changes due to the thermal neutron radiation effects compared to the QD based sample.

  16. Uncooled Radiation Hard SiC Schottky VUV Detectors Capable of Single Photon Sensing, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — This project seeks to design, fabricate, characterize and commercialize very large area, uncooled and radiative hard 4H-SiC VUV detectors capable of near single...

  17. Characterization and Reliability of Vertical N-Type Gallium Nitride Schottky Contacts

    Science.gov (United States)

    2016-09-01

    aluminum / gallium arsenide Schottky diodes,” J. Appl. Phys., vol. 69, no. 10, pp. 7142–7145, May, 1991. 80 THIS PAGE INTENTIONALLY LEFT BLANK...EECP equilibrium of electrochemical potential GaAs gallium arsenide GaN gallium nitride HEMT high-electron mobility transistor HF hydrofluoric acid...only one of the mechanisms [8]-[11]. For high mobility n-type Schottky contacts like Si, gallium arsenide (GaAs), and GaN, thermionic emission is

  18. Investigation of the radiation hardness of GaAs sensors in an electron beam

    CERN Document Server

    K. Afanaciev, K; P. Bernitt, P; G. Chelkov, G; J. Gajewski, J; M. Gostkin, M; Ch Grah, Ch; R. Heller, R; H. Henschel, H; A. Ignatenko, A; Z. Krumshteyn, Z; S. Kulis, S; W. Lange, W; W. Lohmann, W; D. Mokeev, D; V. Novikov, V; M. Ohlerich, M; A. Rosca, A; A. Sapronov, A; R.S. Schmidt, R S; S. Schuwalow, S; O. Tolbanov, O; A. Tyazhev, A

    2012-01-01

    A compact and finely grained sandwich calorimeter is designed to instrument the very forward region of a detector at a future e+e− collider. The calorimeter will be exposed to low energy e+e− pairs originating from beamstrahlung, resulting in absorbed doses of about one MGy per year. GaAs pad sensors interleaved with tungsten absorber plates are considered as an option for this calorimeter. Several Cr-doped GaAs sensor prototypes were produced and irradiated with 8.5–10 MeV electrons up to a dose of 1.5 MGy. The sensor performance was measured as a function of the absorbed dose.

  19. The ultraviolet radiation detectors based on wide-bandgap Schottky barrier structures

    CERN Document Server

    Blank, T V; Konstantinov, O V

    2002-01-01

    Recently, much attention has been given to measure and control ultraviolet radiation (UVR) from the Sun and artificial sources. We present photodetectors based on different wide-bandgap surface-barrier structures, which exhibit linear photocurrent-radiant flux characteristics in the range 10 sup - sup 2 -10 sup 3 W/m sup 2 and can register different types of UVR. The use of light filter UFS-6 with GaP photodetector results in a spectral photosensitivity range corresponding to the Sun UV radiation if observed on Earth. The spectral sensitivity range of the photodetectors based on 4H-SiC is near the spectrum of relative effectiveness of various wavelengths in bactericidal UVR. The photosensitivity of the surface-barrier photodetectors based on wide-bandgap semiconductors exhibits the essential decline in the short-wavelength UVR region (5-6 eV), which is the region of intrinsic absorption of the semiconductor. We propose a hot exciton model, according to which the hot excitons can form in the process of the pho...

  20. Terahertz radiation on the base of accelerated charge carriers in GaAs; Terahertz-Strahlung auf der Basis beschleunigter Ladungstraeger in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Dreyhaupt, Andre

    2008-07-01

    Electromagnetic radiation in the frequency range between about 100 GHz and 5 THz can be used for spectroscopy and microscopy, but it is also promising for security screening and even wireless communication. In the present thesis a planar photoconducting large-area THz radiation source is presented. The device exhibits outstanding properties, in particular high THz field strength and generation efficiency and large spectral bandwidth with short THz pulse length. The THz emission is based on acceleration and deceleration of photoexcited carriers in semiconductor substrates. A metallic interdigitated structure at the surface of semi-insulating GaAs provides the electrodes of an Auston switch. In a biased structure photoexcited charge carriers are accelerated. Hence electromagnetic waves are emitted. An appropriately structured second metallization, electrically isolated from the electrodes, prevents destructive interference of the emitted waves. The structure investigated here combines several advantages of different conventional photoconducting THz sources. First, it provides high electric acceleration fields at moderate voltages owing to the small electrode separation. Second, the large active area in the mm2 range allows excitation by large optical powers of some mW. Optical excitation with near-infrared femtosecond lasers is possible with repetition rates in the GHz range. The presented results point out the excellent characteristics regarding the emitted THz field strength, average power, spectral properties, and easy handling of the interdigitated structure in comparison to various conventional emitter structures. Various modifications of the semiconductor substrate and the optimum excitation conditions were investigated. In the second part of this thesis the dynamic conductivity of GaAs/Al{sub x}Ga{sub 1-x}As superlattices in an applied static electric field was investigated with time-resolved THz spectroscopy. The original goal was to explore whether the

  1. Spectroscopic properties and radiation damage investigation of a diamond based Schottky diode for ion-beam therapy microdosimetry

    Energy Technology Data Exchange (ETDEWEB)

    Verona, C.; Marinelli, Marco; Verona-Rinati, G. [INFN - Dipartimento di Ingegneria Industriale, Università di Roma “Tor Vergata,” Roma (Italy); Magrin, G.; Solevi, P.; Mayer, R. [EBG MedAustron Marie Curie-St. 5, 2700 Wiener Neustadt (Austria); Grilj, V.; Jakšić, M. [Ruder Boškovic Institute, Bijenicka cesta 54, P.O. Box 180, 10002 Zagreb (Croatia)

    2015-11-14

    In this work, a detailed analysis of the properties of a novel microdosimeter based on a synthetic single crystal diamond is reported. Focused ion microbeams were used to investigate the device spectropscopic properties as well as the induced radiation damage effects. A diamond based Schottky diode was fabricated by chemical vapor deposition with a very thin detecting region, about 400 nm thick (approximately 1.4 μm water equivalent thickness), corresponding to the typical size in microdosimetric measurements. A 200 × 200 μm{sup 2} square metallic contact was patterned on the diamond surface by standard photolithography to define the sensitive area. Experimental measurements were carried out at the Ruder Boškovic′ Institute microbeam facility using 4 MeV carbon and 5 MeV silicon ions. Ion beam induced charge maps were employed to characterize the microdosimeter response in terms of its charge collection properties. A stable response with no evidence of polarization or memory effects was observed up to the maximum investigated ion beam flux of about 1.7 × 10{sup 9} ions·cm{sup −2}·s{sup −1}. A homogeneity of the response about 6% was found over the sensitive region with a well-defined confinement of the response within the active area. Tests of the radiation damage effect were performed by selectively irradiating small areas of the device with different ion fluences, up to about 10{sup 12} ions/cm{sup 2}. An exponential decrease of the charge collection efficiency was observed with a characteristic decay constant of about 4.8 MGy and 1 MGy for C and Si ions, respectively. The experimental data were analyzed by means of GEANT4 Monte Carlo simulations. A direct correlation between the diamond damaging effect and the Non Ionizing Energy Loss (NIEL) fraction was found. In particular, an exponential decay of the charge collection efficiency with an exponential decay as a function of NIEL is observed, with a characteristic constant of about

  2. The Fabrication and Characterization of Ni/4H-SiC Schottky Diode Radiation Detectors with a Sensitive Area of up to 4 cm2

    Directory of Open Access Journals (Sweden)

    Lin-Yue Liu

    2017-10-01

    Full Text Available Silicon carbide (SiC detectors of an Ni/4H-SiC Schottky diode structure and with sensitive areas of 1–4 cm2 were fabricated using high-quality lightly doped epitaxial 4H-SiC material, and were tested in the detection of alpha particles and pulsed X-rays/UV-light. A linear energy response to alpha particles ranging from 5.157 to 5.805 MeV was obtained. The detectors were proved to have a low dark current, a good energy resolution, and a high neutron/gamma discrimination for pulsed radiation, showing the advantages in charged particle detection and neutron detection in high-temperature and high-radiation environments.

  3. GaAs pixel radiation detector as an autoradiography tool for genetic studies

    Energy Technology Data Exchange (ETDEWEB)

    Bertolucci, E. [Physics Department, Universita' di Napoli Federico II and INFN, Napoli (Italy); Conti, M. [Physics Department, Universita' di Napoli Federico II and INFN, Napoli (Italy); Mettivier, G. [Physics Department, Universita' di Napoli Federico II and INFN, Napoli (Italy); Russo, P. [Physics Department, Universita' di Napoli Federico II and INFN, Napoli (Italy); Amendolia, S.R. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Bisogni, M.G. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Bottigli, U. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Ceccopieri, A. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Ciocci, M.A. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Delogu, P. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Fantacci, M.E. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Maestro, P. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Marzulli, V.M. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Pernigotti, E. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Romeo, N. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Rosso, V. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Stefanini, A. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy); Stumbo, S. [Physics Department, Universita' di Pisa and INFN, Pisa (Italy)

    1999-02-11

    We present an autoradiography tool to be used mainly for genetic studies. It performs a quantitative analysis of radioactivity and can follow a dynamic process. We designed several applications, in particular one aimed at detecting hybridization of radio-labeled DNA fragments with known DNA-probes deposited on a micro-array. The technique is based on GaAs pixel array detector and low threshold, large dynamic range and good sensitivity integrated electronics developed for medical applications, suitable to detect markers (gamma or beta) such as {sup 14}C, {sup 35}S, {sup 33}P, {sup 32}P, {sup 125}I, even at very low activities. A Monte Carlo simulation of {beta}{sup -} detection in GaAs is presented here in order to study the spatial resolution characteristics of such a system. For several biological applications, the electronics is required to perform at high temperatures (from 37 deg. to 68 deg. ): we present here studies of noise and minimum threshold as a function of the temperature.

  4. ITER TASK T252 (1995):Gamma radiation testing of a GaAs operational amplifier for instrument applications

    International Nuclear Information System (INIS)

    Hiemstra, D.

    1996-03-01

    The purpose of this 1995 ITER task was : to build an improved operational amplifier using GaAs MESFET technology, to build a reference voltage subcircuit using GaAs MESFET technology and to investigate the potential of GaAs HBT's to improve the noise performance of the GaAs MESFET operational amplifier. This work addresses the need for instrumentation-grade components to read sensors in an experimental fusion reactor, where the anticipated total dose for a useful service life is 3Grad(GaAs). It is an extension of our 1994 work. 3 tabs., 6 figs

  5. Radiation effects on ohmic and Schottky contacts based on 4H and 6H-SiC

    International Nuclear Information System (INIS)

    Cinar, Kuebra; Coskun, Cevdet; Guer, Emre; Aydogan, Sakir

    2009-01-01

    A systematic study of Ni based ohmic and Schottky contacts (SCs) onto the n-4H-SiC and n-6H-SiC under relatively low-dose (1 x 10 12 e - cm -2 ) and high-energy (6, 12, 15 MeV) electron irradiation (HEEI) has been introduced. Lower specific contact resistivity has been reached for Ni based ohmic contact structures on both 4H and 6H-SiC after each electron irradiation. This finding has been explained by the displacement damage produced by the collision of electrons with atoms of Ni contact material. It has been observed that the HEEI caused to increase in the ideality factors of both SCs indicating deviation from thermionic emission theory in current transport mechanism. While the Schottky barrier height (SBH) for Ni/4H-SiC SC remains nearly constant, an increase has been observed for the Ni/6H-SiC SC. Donor concentrations for both diodes have decreased with increasing electron energy probably due to the trapping effect of the irradiation induced defect(s).

  6. Radiation effects on ohmic and Schottky contacts based on 4H and 6H-SiC

    Energy Technology Data Exchange (ETDEWEB)

    Cinar, Kuebra [Department of Physics, Faculty of Sciences and Arts, Atatuerk University, 25240 Erzurum (Turkey); Coskun, Cevdet [Department of Physics, Faculty of Sciences and Arts, Atatuerk University, 25240 Erzurum (Turkey)], E-mail: ccoskun@atauni.edu.tr; Guer, Emre; Aydogan, Sakir [Department of Physics, Faculty of Sciences and Arts, Atatuerk University, 25240 Erzurum (Turkey)

    2009-01-15

    A systematic study of Ni based ohmic and Schottky contacts (SCs) onto the n-4H-SiC and n-6H-SiC under relatively low-dose (1 x 10{sup 12} e{sup -} cm{sup -2}) and high-energy (6, 12, 15 MeV) electron irradiation (HEEI) has been introduced. Lower specific contact resistivity has been reached for Ni based ohmic contact structures on both 4H and 6H-SiC after each electron irradiation. This finding has been explained by the displacement damage produced by the collision of electrons with atoms of Ni contact material. It has been observed that the HEEI caused to increase in the ideality factors of both SCs indicating deviation from thermionic emission theory in current transport mechanism. While the Schottky barrier height (SBH) for Ni/4H-SiC SC remains nearly constant, an increase has been observed for the Ni/6H-SiC SC. Donor concentrations for both diodes have decreased with increasing electron energy probably due to the trapping effect of the irradiation induced defect(s)

  7. Performance study of radiation detectors based on semi-insulating GaAs with P+homo- and heterojunction blocking electrode

    Czech Academy of Sciences Publication Activity Database

    Dubecky, F.; Hulicius, Eduard; Frigeri, P.; Perd´ochová-Šagátová, A.; Zat´ko, B.; Hubík, Pavel; Gombia, E.; Boháček, P.; Pangrác, Jiří; Franchi, S.; Nečas, V.

    2006-01-01

    Roč. 563, - (2006), s. 159-162 ISSN 0168-9002 R&D Projects: GA AV ČR(CZ) IAA1010404 Grant - others:Slovak Grant Agency for Science(SK) 2/4151/24 Institutional research plan: CEZ:AV0Z10100521 Keywords : GaAs radiation detector * blocking electrode * P + -N homojunction and heterojunction * gamma irradiation Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.185, year: 2006

  8. Investigation of the radiation damage of GaAs detectors by protons, pions and neutrons

    Energy Technology Data Exchange (ETDEWEB)

    Luebelsmeyer, K. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Arbabi, S. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Braunschweig, W. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Chu, Z. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Krais, R. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Kubicki, T. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Rente, C. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Syben, O. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Tenbusch, F. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Toporowski, M. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Wittmer, B. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.; Xiao, W.J. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.

    1997-05-01

    Surface barrier detectors processed in Aachen using semi-insulating (SI) GaAs from several manufacturers have been irradiated with high fluences of neutrons (mean energy 1 MeV, fluence up to {Phi}{sub n} {proportional_to} 5 x 10{sup 14} cm{sup -2}), pions (191 MeV, fluence up to {Phi}{sub {pi}} {proportional_to} 0.6 x 10{sup 14} cm{sup -2}) and protons (23 GeV, fluence up to {Phi}{sub p} {proportional_to} 2 x 10{sup 14} cm{sup -2}). The detectors have been characterized in terms of macroscopic quantities like I-V characteristic curves and charge collection efficiencies for incident minimum ionizing- (mip) as well as {alpha}-particles. All detectors work well after the exposure. At the highest fluences a sizable degradation in the charge collection efficiencies has been observed for all investigated materials. SI-GaAs material with low carbon (LC) content seems to be less affected than substrates with a higher carbon concentration. At the highest irradiation level the mip signal from a 250 {mu}m thick detector made of LC material amounts to 8000 electrons (at 400 V bias voltage) independent of peaking times between 40 ns and 2.2 {mu}s. The leakage currents for this material are even reduced after the irradiation. (orig.).

  9. Monte Carlo simulation of THz radiation from GaAs p-i-n diodes under high electric fields using an extended valley model

    International Nuclear Information System (INIS)

    Dinh Nhu Thao

    2008-01-01

    We have applied a self-consistent ensemble Monte Carlo simulation procedure using an extended valley model to consider the THz radiation from GaAs p-i-n diodes under high electric fields. The present calculation has shown an important improvement of the numerical results when using this model instead of the usual valley model. It has been shown the importance of the full band-structure in the simulation of processes in semiconductors, especially under the influence of high electric fields. (author)

  10. Calculation of the Electronic Parameters of an Al/DNA/p-Si Schottky Barrier Diode Influenced by Alpha Radiation

    Directory of Open Access Journals (Sweden)

    Hassan Maktuff Jaber Al-Ta'ii

    2015-02-01

    Full Text Available Many types of materials such as inorganic semiconductors have been employed as detectors for nuclear radiation, the importance of which has increased significantly due to recent nuclear catastrophes. Despite the many advantages of this type of materials, the ability to measure direct cellular or biological responses to radiation might improve detector sensitivity. In this context, semiconducting organic materials such as deoxyribonucleic acid or DNA have been studied in recent years. This was established by studying the varying electronic properties of DNA-metal or semiconductor junctions when exposed to radiation. In this work, we investigated the electronics of aluminium (Al/DNA/silicon (Si rectifying junctions using their current-voltage (I-V characteristics when exposed to alpha radiation. Diode parameters such as ideality factor, barrier height and series resistance were determined for different irradiation times. The observed results show significant changes with exposure time or total dosage received. An increased deviation from ideal diode conditions (7.2 to 18.0 was observed when they were bombarded with alpha particles for up to 40 min. Using the conventional technique, barrier height values were observed to generally increase after 2, 6, 10, 20 and 30 min of radiation. The same trend was seen in the values of the series resistance (0.5889–1.423 Ω for 2–8 min. These changes in the electronic properties of the DNA/Si junctions could therefore be utilized in the construction of sensitive alpha particle detectors.

  11. Evidence for plasma effect on charge collection efficiency in proton irradiated GaAs detectors

    CERN Document Server

    Nava, F; Canali, C; Vittone, E; Polesello, P; Biggeri, U; Leroy, C

    1999-01-01

    The radiation damage in 100 mu m thick Schottky diodes made on semi-insulating undoped GaAs materials, were studied using alpha-, beta-, proton- and gamma-spectroscopy as well as I-V measurements. The results have been analysed within the framework of the Hecht model to investigate the influence of the plasma produced by short-range strongly ionising particles on the detector performance after 24 GeV proton irradiation. It has been found that with the mean free drift lengths for electrons and holes determined from alpha-spectra in overdepleted detectors, the charge collection efficiency for beta-particles, cce subbeta, is well predicted in the unirradiated detectors, while in the most irradiated ones, the cce subbeta is underestimated by more than 40%. The observed disagreement can be explained by assuming that the charge carrier recombination in the plasma region of such detectors, becomes significant.

  12. A comparative study of low energy radiation response of AlAs, GaAs and GaAs/AlAs superlattice and the damage effects on their electronic structures.

    Science.gov (United States)

    Jiang, M; Xiao, H Y; Peng, S M; Yang, G X; Liu, Z J; Zu, X T

    2018-01-31

    In this study, the low energy radiation responses of AlAs, GaAs and GaAs/AlAs superlattice are simulated and the radiation damage effects on their electronic structures are investigated. It is found that the threshold displacement energies for AlAs are generally larger than those for GaAs, i.e., the atoms in AlAs are more difficult to be displaced than those in GaAs under radiation environment. As for GaAs/AlAs superlattice, the Ga and Al atoms are more susceptible to the radiation than those in the bulk AlAs and GaAs, whereas the As atoms need comparable or much larger energies to be displaced than those in the bulk states. The created defects are generally Frenkel pairs, and a few antisite defects are also created in the superlattice structure. The created defects are found to have profound effects on the electronic properties of GaAs/AlAs superlattice, in which charge transfer, redistribution and even accumulation take place, and band gap narrowing and even metallicity are induced in some cases. This study shows that it is necessary to enhance the radiation tolerance of GaAs/AlAs superlattice to improve their performance under irradiation.

  13. Energy dispersive x-ray diffraction from Ge, GaAs, GaP, and AlSb at high pressures using synchrotron radiation

    International Nuclear Information System (INIS)

    Baublitz, M.A. Jr.

    1982-01-01

    The practicality of energy dispersive X-ray diffraction from high pressure powder specimens using synchrotron radiation has been demonstrated. Reasonable quantitative agreement has been obtained between the experimental diffraction data and the theoretical relative integrated intensities of the diffraction lines for known structures under rather hydrostatic pressure conditions. Pressure-induced structural phase transitions in Ge, GaAs, GaP, and AlSb have been studied in some detail with this energy dispersive diffraction method. Ge transforms to the beta-Sn tetragonal structure as previously observed by Jamieson, but the transition pressure is 80 +- 5 kbars, a somewhat lower value than generally reported. GaAs exhibits an orthorhombic structure above 172 +- 7 kbars, GaP a tetragonal structure above 215 +- 8 kbars, and AlSb an orthorhombic structure above 77 +- 5 kbars. Although the space groups of these latter three high pressure polymorphs have not been determined unequivocally, mainly due to the apparent presence of crystalline defects, some possible models are described for these high pressure structures. Lastly, a comparison of the existing phase transition data with the theoretical diagrams of Zunger, based on pseudopotential length scales, indicates that it may be possible to predict the high pressure polymorphs of crystals with diamond or cubic zincblende structures at ambient conditions

  14. A 250 GHz planar low noise Schottky receiver

    Science.gov (United States)

    Ali-Ahmad, Walid Y.; Bishop, William L.; Crowe, Thomas W.; Rebeiz, Gabriel M.

    1993-01-01

    A planar quasi-optical Schottky receiver based on the quasi-integrated horn antenna has been developed and tested over the 230-280 GHz bandwidth. The receiver consists of a planar GaAs Schottky diode placed at the feed of a dipole-probe suspended on a thin dielectric membrane in an etched-pyramidal horn cavity. The diode has a 1.21 micron anode diameter and a low parasitic capacitance due to the use of an etched surface channel. The antenna-mixer results in a measured DSB conversion loss and noise temperature at 258 GHz of 7.2 dB +/- 0.5 dB and 1310 K +/- 70 K, respectively, at room temperature. The design is compatible with SIS mixers, and the low cost of fabrication and simplicity makes it ideal for submillimeter-wave imaging arrays requiring a 10-20 percent bandwidth.

  15. Study of GaAs as a material for solar neutrino detectors

    Energy Technology Data Exchange (ETDEWEB)

    Markov, A.V.; Polyakov, A.Y. E-mail: polyakov@mail.girmet.ru; Smirnov, N.B.; Govorkov, A.V.; Eremin, V.K.; Verbitskaya, E.M.; Gavrin, V.N.; Kozlova, Y.P.; Veretenkin, Y.P.; Bowles, T.J

    2000-01-11

    Semi-insulating GaAs crystals grown by liquid encapsulated Czochralski technique from Ga-rich melts were evaluated as a possible material for radiation detectors with a high active layer thickness. The density of deep traps, particularly the midgap EL2 donors pinning the Fermi level, was measured by various techniques in conducting and semi-insulating samples. For EL2 traps, a direct evidence of their partial neutralization in the space charge region of reverse biased Schottky diodes due to nonequilibrium capture of electrons is presented for the first time. It is shown that the density of EL2 centers decreases with decreased As composition of the melt very gradually, especially for post-growth annealed samples. Subsequently, if one aims to decrease the EL2 density to such an extent that it would make a serious impact on the depletion layer width in GaAs-based detectors one has to grow semi-insulating GaAs crystals from melts with As composition below about 43% which poses a problem for the preservation of high resistivity of the material due to the relatively high concentration of compensating acceptors.

  16. Study of GaAs as a material for solar neutrino detectors

    CERN Document Server

    Markov, A V; Smirnov, N B; Govorkov, A V; Eremin, V K; Verbitskaya, E; Gavrin, V N; Kozlova, Y P; Veretenkin, Y P; Bowles, T J

    2000-01-01

    Semi-insulating GaAs crystals grown by liquid encapsulated Czochralski technique from Ga-rich melts were evaluated as a possible material for radiation detectors with a high active layer thickness. The density of deep traps, particularly the midgap EL2 donors pinning the Fermi level, was measured by various techniques in conducting and semi-insulating samples. For EL2 traps, a direct evidence of their partial neutralization in the space charge region of reverse biased Schottky diodes due to nonequilibrium capture of electrons is presented for the first time. It is shown that the density of EL2 centers decreases with decreased As composition of the melt very gradually, especially for post-growth annealed samples. Subsequently, if one aims to decrease the EL2 density to such an extent that it would make a serious impact on the depletion layer width in GaAs-based detectors one has to grow semi-insulating GaAs crystals from melts with As composition below about 43% which poses a problem for the preservation of hi...

  17. Andreev reflections at interfaces between delta-doped GaAs and superconducting Al films

    DEFF Research Database (Denmark)

    Taboryski, Rafael Jozef; Clausen, Thomas; Hansen, Jørn Bindslev

    1996-01-01

    By placing several Si delta-doped layers close to the surface of a GaAs molecular beam epitaxy-grown crystal, we achieve a compensation of the Schottky barrier and obtain a good Ohmic contact between an in situ deposited (without breaking the vacuum) Al metallization layer and a highly modulation...

  18. Capacitance-voltage characteristics of GaAs ion-implanted structures

    Directory of Open Access Journals (Sweden)

    Privalov E. N.

    2008-08-01

    Full Text Available A noniterative numerical method is proposed to calculate the barrier capacitance of GaAs ion-implanted structures as a function of the Schottky barrier bias. The features of the low- and high-frequency capacitance-voltage characteristics of these structures which are due to the presence of deep traps are elucidated.

  19. High-Performance GaAs Nanowire Solar Cells for Flexible and Transparent Photovoltaics.

    Science.gov (United States)

    Han, Ning; Yang, Zai-xing; Wang, Fengyun; Dong, Guofa; Yip, SenPo; Liang, Xiaoguang; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C

    2015-09-16

    Among many available photovoltaic technologies at present, gallium arsenide (GaAs) is one of the recognized leaders for performance and reliability; however, it is still a great challenge to achieve cost-effective GaAs solar cells for smart systems such as transparent and flexible photovoltaics. In this study, highly crystalline long GaAs nanowires (NWs) with minimal crystal defects are synthesized economically by chemical vapor deposition and configured into novel Schottky photovoltaic structures by simply using asymmetric Au-Al contacts. Without any doping profiles such as p-n junction and complicated coaxial junction structures, the single NW Schottky device shows a record high apparent energy conversion efficiency of 16% under air mass 1.5 global illumination by normalizing to the projection area of the NW. The corresponding photovoltaic output can be further enhanced by connecting individual cells in series and in parallel as well as by fabricating NW array solar cells via contact printing showing an overall efficiency of 1.6%. Importantly, these Schottky cells can be easily integrated on the glass and plastic substrates for transparent and flexible photovoltaics, which explicitly demonstrate the outstanding versatility and promising perspective of these GaAs NW Schottky photovoltaics for next-generation smart solar energy harvesting devices.

  20. Effect of 60Co γ-irradiation on the nature of electronic transport in heavily doped n-type GaN based Schottky photodetectors

    Science.gov (United States)

    Chatterjee, Abhishek; Khamari, Shailesh K.; Porwal, S.; Kher, S.; Sharma, T. K.

    2018-04-01

    GaN Schottky photodetectors are fabricated on heavily doped n-type GaN epitaxial layers grown by the hydride vapour phase epitaxy technique. The effect of 60Co γ-radiation on the electronic transport in GaN epilayers and Schottky detectors is studied. In contrast to earlier observations, a steady rise in the carrier concentration with increasing irradiation dose is clearly seen. By considering a two layer model, the contribution of interfacial dislocations in carrier transport is isolated from that of the bulk layer for both the pristine and irradiated samples. The bulk carrier concentration is fitted by using the charge balance equation which indicates that no new electrically active defects are generated by γ-radiation even at 500 kGy dose. The irradiation induced rise in the bulk carrier concentration is attributed to the activation of native Si impurities that are already present in an electrically inert form in the pristine sample. Further, the rise in interfacial contribution in the carrier concentration is governed by the enhanced rate of formation of nitrogen vacancies by irradiation, which leads to a larger diffusion of oxygen impurities. A large value of the characteristic tunnelling energy for both the pristine and irradiated Au/Ni/GaN Schottky devices confirms that the dislocation-assisted tunnelling dominates the low temperature current transport even after irradiation. The advantage of higher displacement energy and larger bandgap of GaN as compared to GaAs is evident from the change in leakage current after irradiation. Further, a fast recovery of the photoresponse of GaN photodetectors after irradiation signifies their compatibility to operate in high radiation zones. The results presented here are found to be crucial in understanding the interaction of 60Co γ-irradiation with n+-GaN epilayers.

  1. SCHOTTKY MEASUREMENTS DURING RHIC 2000

    International Nuclear Information System (INIS)

    CAMERON, P.; CUPOLO, J.; DEGEN, C.; HAMMONS, L.; KESSELMAN, M.; LEE, R.; MEYER, A.; SIKORA, R.

    2001-01-01

    The 2GHz Schottky system was a powerful diagnostic during RHIC 2000 commissioning. A continuous monitor without beam excitation, it provided betatron tune, chromaticity, momentum spread relative emittance, and synchrotron tune. It was particularly useful during transition studies. In addition, a BPM was resonated at 230MHz for Schottky measurements

  2. Analysis and modelling of GaN Schottky-based circuits at millimeter wavelengths

    International Nuclear Information System (INIS)

    Pardo, D; Grajal, J

    2015-01-01

    This work presents an analysis of the capabilities of GaN Schottky diodes for frequency multipliers and mixers at millimeter wavelengths. By using a Monte Carlo (MC) model of the diode coupled to a harmonic balance technique, the electrical and noise performances of these circuits are investigated. Despite the lower electron mobility of GaN compared to GaAs, multipliers based on GaN Schottky diodes can be competitive in the first stages of multiplier chains, due to the excellent power handling capabilities of this material. The performance of these circuits can be improved by taking advantage of the lateral Schottky diode structures based on AlGaN/GaN HEMT technology. (paper)

  3. A collection of Schottky-scan notes

    International Nuclear Information System (INIS)

    Sabersky, A.P.

    1980-10-01

    This paper is a republication of ISR-RF notes and performance reports on work done in 1974-1975. The original notes have been edited, corrected and, in most cases, shortened. Discussed in this note are the following topics: noise, errors and the Schottky scan; speeding up the Schottky scan; Schottky markers and fast Schottky scans; and some engineering aspects of the fast Schottky scan

  4. High Power Ga2O3-based Schottky Diode, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Program will develop a new generation of radiation hard high-power high-voltage Ga2O3-based Schottky diode, which is suitable for applications in the space...

  5. Electrical characteristics of AlGaN-GaN high electron mobility transistors and AlGaN Schottky diodes irradiated with protons

    Science.gov (United States)

    Sin, Yongkun; Presser, Nathan; Foran, Brendan; LaLumondiere, Stephen; Lotshaw, William; Moss, Steven C.

    2014-03-01

    AlGaN-GaN high electron mobility transistors (HEMTs) are most suitable for commercial and military applications requiring high voltage, high power, and high efficiency operation. In recent years, leading AlGaN HEMT manufacturers have reported encouraging reliability of these devices, but their long-term reliability especially in the space environment still remains a major concern. In addition, degradation mechanisms in AlGaN HEMT devices are still not well understood, and a large number of traps and defects present both in the bulk and at the surface lead to undesirable characteristics. Study of reliability and radiation effects of AlGaN-GaN HEMTs is therefore necessary before GaN HEMT technology is successfully employed in satellite communication systems. For the present study, we investigated electrical characteristics of AlGaN-GaN HEMTs and AlGaN Schottky diodes irradiated with protons. We studied two types of MOCVD-grown AlGaN HEMTs on semi-insulating SiC substrates (HEMT-1 and HEMT-2) as well as MOCVD-grown Al0.27Ga 0.73N Schottky diodes on conducting SiC substrates. Our HEMT-1 structure consisted of a GaN cap, AlGaN/AlN barrier, and 2 μm GaN buffer layers. Our HEMT-2 structure consisting of undoped AlGaN barrier and GaN buffer layers grown on an AlN nucleation layer showed a charge sheet density of ~1013/cm2 and a Hall mobility of ~1500 cm2 /V.sec. Our HEMT-1 devices had a Pt-Au Schottky gate length of 0.2 μm, a total gate width of 200-400 μm periphery, and SiNx passivation. Electrical characteristics of AlGaN-GaN HEMTs and AlGaN Schottky diodes were compared before and after they were proton irradiated with different energies and fluences. Current-mode deep level transient spectroscopy (DLTS) and capacitance-mode DLTS were employed to study pre-proton irradiation trap characteristics in the AlGaN-GaN HEMTs and AlGaN Schottky diodes, respectively. Focused ion beam (FIB) was employed to prepare both cross-sectional and plan view TEM samples for defect

  6. Organic modification of metal / semiconductor Schottky contacts

    Energy Technology Data Exchange (ETDEWEB)

    Mendez Pinzon, H.A.

    2006-07-10

    In the present work a Metal / organic / inorganic semiconductor hybrid heterostructure (Ag / DiMe-PTCDI / GaAs) was built under UHV conditions and characterised in situ. The aim was to investigate the influence of the organic layer in the surface properties of GaAs(100) and in the electrical response of organic-modified Ag / GaAs Schottky diodes. The device was tested by combining surface-sensitive techniques (Photoemission spectroscopy and NEXAFS) with electrical measurements (current-voltage, capacitance-voltage, impedance and charge transient spectroscopies). Core level examination by PES confirms removal of native oxide layers on sulphur passivated (S-GaAs) and hydrogen plasma treated GaAs(100) (H+GaAs) surfaces. Additional deposition of ultrathin layers of DiMe-PTCDI may lead to a reduction of the surface defects density and thereby to an improvement of the electronic properties of GaAs. The energy level alignment through the heterostructure was deduced by combining UPS and I-V measurements. This allows fitting of the I-V characteristics with electron as majority carriers injected over a barrier by thermionic emission as a primary event. For thin organic layers (below 8 nm thickness) several techniques (UPS, I-V, C-V, QTS and AFM) show non homogeneous layer growth, leading to formation of voids. The coverage of the H+GaAs substrate as a function of the nominal thickness of DiMe-PTCDI was assessed via C-V measurements assuming a voltage independent capacitance of the organic layer. The frequency response of the device was evaluated through C-V and impedance measurements in the range 1 kHz-1 MHz. The almost independent behaviour of the capacitance in the measured frequency range confirmed the assumption of a near geometrical capacitor, which was used for modelling the impedance with an equivalent circuit of seven components. From there it was found a predominance of the space charge region impedance, so that A.C. conduction can only takes place through the

  7. Graphene-GaN Schottky Photodiodes

    Data.gov (United States)

    National Aeronautics and Space Administration — Graphene-GaN Schottky Photodiodes is the development of the world's first graphene-based GaN Schottky device that has the potential to achieve a much greater total...

  8. 670-GHz Schottky Diode-Based Subharmonic Mixer with CPW Circuits and 70-GHz IF

    Science.gov (United States)

    Chattopadhyay, Goutam; Schlecht, Erich T.; Lee, Choonsup; Lin, Robert H.; Gill, John J.; Mehdi, Imran; Sin, Seth; Deal, William; Loi, Kwok K.; Nam, Peta; hide

    2012-01-01

    GaAs-based, sub-harmonically pumped Schottky diode mixers offer a number of advantages for array implementation in a heterodyne receiver system. Since the radio frequency (RF) and local oscillator (LO) signals are far apart, system design becomes much simpler. A proprietary planar GaAs Schottky diode process was developed that results in very low parasitic anodes that have cutoff frequencies in the tens of terahertz. This technology enables robust implementation of monolithic mixer and frequency multiplier circuits well into the terahertz frequency range. Using optical and e-beam lithography, and conventional epitaxial layer design with innovative usage of GaAs membranes and metal beam leads, high-performance terahertz circuits can be designed with high fidelity. All of these mixers use metal waveguide structures for housing. Metal machined structures for RF and LO coupling hamper these mixers to be integrated in multi-pixel heterodyne array receivers for spectroscopic and imaging applications. Moreover, the recent developments of terahertz transistors on InP substrate provide an opportunity, for the first time, to have integrated amplifiers followed by Schottky diode mixers in a heterodyne receiver at these frequencies. Since the amplifiers are developed on a planar architecture to facilitate multi-pixel array implementation, it is quite important to find alternative architecture to waveguide-based mixers.

  9. The characterisation of selective proton damage on GaAs solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Aliyu, Y.H. (School of Electrical, Electronic and Systems Engineering, Wales Univ., Cardiff (United Kingdom)); Morgan, D.V. (School of Electrical, Electronic and Systems Engineering, Wales Univ., Cardiff (United Kingdom)); Bunce, R.W. (School of Electrical, Electronic and Systems Engineering, Wales Univ., Cardiff (United Kingdom))

    1993-01-16

    Selective ion bombardment damage was induced on n/n[sup +] GaAs Schottky barrier solar cell structure using several proton energies and doses. The damage in the surface, interface, and the bulk regions were characterised by I-V, C-V, and thermally stimulated current technique (TSC). A correlation between the selective damages and the nature of the defects and their location was obtained. (orig.)

  10. Fabrication and Characterization of n-AlGaAs/GaAs Schottky Diode for Rectenna Device Application

    International Nuclear Information System (INIS)

    Parimon, Norfarariyanti; Mustafa, Farahiyah; Hashim, Abdul Manaf; Rahman, Shaharin Fadzli Abd; Rahman, Abdul Rahim Abdul; Osman, Mohd Nizam

    2011-01-01

    Schottky diode was designed and fabricated on n-AlGaAs/GaAs high electron mobility transistor (HEMT) structure for rectenna device application. Rectenna is one of the most potential devices to form the wireless power supply which is really good at converting microwaves to DC. The processing steps used in the fabrication of Schottky diode were the conventional steps used in standard GaAs processing. Current-voltage (I-V) measurements showed that the device had rectifying properties with a barrier height of 0.5468 eV for Ni/Au metallization. The fabricated Schottky diode detected RF signals and the cut-off frequency up to 20 GHz was estimated in direct injection experiments. These preliminary results will provide a breakthrough for the direct integration with antenna towards realization of rectenna device application.

  11. Fabrication and Characterization of n-AlGaAs/GaAs Schottky Diode for Rectenna Device Application

    Energy Technology Data Exchange (ETDEWEB)

    Parimon, Norfarariyanti; Mustafa, Farahiyah; Hashim, Abdul Manaf; Rahman, Shaharin Fadzli Abd; Rahman, Abdul Rahim Abdul [Material Innovations and Nanoelectronics Research Group, Faculty of Electrical Engineering, Universiti Teknologi Malaysia, 81310 Skudai, Johor (Malaysia); Osman, Mohd Nizam, E-mail: manaf@fke.utm.my [Telekom Research and Development, TM Innovation Centre, 63000 Cyberjaya (Malaysia)

    2011-02-15

    Schottky diode was designed and fabricated on n-AlGaAs/GaAs high electron mobility transistor (HEMT) structure for rectenna device application. Rectenna is one of the most potential devices to form the wireless power supply which is really good at converting microwaves to DC. The processing steps used in the fabrication of Schottky diode were the conventional steps used in standard GaAs processing. Current-voltage (I-V) measurements showed that the device had rectifying properties with a barrier height of 0.5468 eV for Ni/Au metallization. The fabricated Schottky diode detected RF signals and the cut-off frequency up to 20 GHz was estimated in direct injection experiments. These preliminary results will provide a breakthrough for the direct integration with antenna towards realization of rectenna device application.

  12. Plastic Schottky barrier solar cells

    Science.gov (United States)

    Waldrop, James R.; Cohen, Marshall J.

    1984-01-24

    A photovoltaic cell structure is fabricated from an active medium including an undoped, intrinsically p-type organic semiconductor comprising polyacetylene. When a film of such material is in rectifying contact with a magnesium electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates the magnesium layer on the undoped polyacetylene film.

  13. Measurements of Effective Schottky Barrier in Inverse Extraordinary Optoconductance Structures

    Science.gov (United States)

    Tran, L. C.; Werner, F. M.; Solin, S. A.; Gilbertson, Adam; Cohen, L. F.

    2013-03-01

    Individually addressable optical sensors with dimensions as low as 250nm, fabricated from metal semiconductor hybrid structures (MSH) of AuTi-GaAs Schottky interfaces, display a transition from resistance decreasing with intensity in micron-scale sensors (Extraordinary Optoconductance, EOC) to resistance increasing with intensity in nano-scale sensors (Inverse Extraordinary Optoconductance I-EOC). I-EOC is attributed to a ballistic to diffusive crossover with the introduction of photo-induced carriers and gives rise to resistance changes of up to 9462% in 250nm devices. We characterize the photo-dependence of the effective Schottky barrier in EOC/I-EOC structures by the open circuit voltage and reverse bias resistance. Under illumination by a 5 mW, 632.8 nm HeNe laser, the barrier is negligible and the Ti-GaAs interface becomes Ohmic. Comparing the behavior of two devices, one with leads exposed, another with leads covered by an opaque epoxy, the variation in Voc with the position of the laser can be attributed to a photovoltaic effect of the lead metal and bulk GaAs. The resistance is unaffected by the photovoltaic offset of the leads, as indicated by the radial symmetry of 2-D resistance maps obtained by rastering a laser across EOC/IEOC devices. SAS has a financial interest in PixelEXX, a start-up company whose mission is to market imaging arrays.

  14. Reactivity and control of III-V surfaces for passivation and Schottky barrier formation

    International Nuclear Information System (INIS)

    Bruno, Giovanni

    2004-01-01

    The N-for-As, P-for-As and Sb-for-As anion exchange reactions at GaAs surfaces, and the N-for-P anion exchange reaction at the GaP surface have been investigated with the aim at the formation of a thin high-gap surface layer for passivation of GaAs and GaP. Among the investigated anion exchange reactions, the P-for-As results in the formation of a ternary alloys GaP y As 1-y not effective for GaAs passivation. The Sb-for-As anion exchange does not occur and results in segregation of Sb at the GaAs surface. The Sb overlayer is effective in the chemical passivation of GaAs. The N-for-As anion exchange by a remote N 2 -H 2 (a mixture of 97% N 2 -3% H 2 ) radiofrequency plasma nitridation procedure forms a very thin (∼5 Angst) GaN layer that is successful in the electronic and chemical passivation of GaAs(1 0 0) surfaces. The N 2 -H 2 (a mixture of 97% N 2 -3% H 2 ) nitridation has been found completely different from the pure N 2 nitridation which, in contrast, do not provide GaAs passivation, because the formation of Ga-N bonds accompanies with AsN and the segregation of elemental As at the GaN/GaAs interface. GaAs-GaN based Schottky structures have also been deposited and characterized by I-V measurements. A chemical and kinetic mechanism for the anion exchange reactions which takes into account also the competitive formation of PAs, AsN, and PN isoelectronic compounds is proposed

  15. Producing of pover GaAs structures of bipolar and field-effect transistor by CVD-method

    Directory of Open Access Journals (Sweden)

    Voronin V. A.

    2010-03-01

    Full Text Available Investigation results in technology of doping Sn and Bi of perfect GaAs structures preparation by the lowe-temperature isothermal chloride epitaxy method are presented. A complex problem has been solved to obtain planar layers of the n+–n–n0–p type bipolar transistors and planar layers of the i–n0–n–n+ type Schottky field-effect transistors. Heterogenetty in the thickness less than 3% and doping level less than 5% has been achieved. This allowed to get the discrete Schottky field-effect transistors with improved operation characteristics.

  16. Schottky signal analysis: tune and chromaticity computation

    CERN Document Server

    Chanon, Ondine

    2016-01-01

    Schottky monitors are used to determine important beam parameters in a non-destructive way. The Schottky signal is due to the internal statistical fluctuations of the particles inside the beam. In this report, after explaining the different components of a Schottky signal, an algorithm to compute the betatron tune is presented, followed by some ideas to compute machine chromaticity. The tests have been performed with offline and/or online LHC data.

  17. Light Intensity Influence on the Effective Schottky Barrier Height in Extraordinary Optoconductance (EOC) Structures

    Science.gov (United States)

    Werner, F. M.; Tran, L. C.; Solin, S. A.

    2013-03-01

    Novel micro to nanoscale metal-semiconductor-hybrid (MSH) structures capable of room temperature light detection have been previously reported and classified as Extraordinary Optoconductance (EOC) devices. The devices are square stacked structures, with a Au-Ti shunt forming a Schottky-Interface with an n-doped Ga-As mesa. Resistance measurements were taken by a 4-point van-der Pauw method to remove contact and lead resistance and eliminate DC offsets. The device's resistance changes as light incident on the surface of the structure modifies the charge density within the body of the device. The change in charge density changes the effective Schottky Barrier height and shifts the measured 4 point resistance of the heterogeneous structure. We investigate the dependence of the effective Schottky Barrier height on the incident intensity of light by measuring the open circuit voltage under various intensities of optical perturbation at room temperature. The barrier height is negligible and the interface ohmic under HeNe laser 632.8 nm illumination at a power density of 636 mW/cm2, allowing the flow of current through the shunt. This device performance will be contrasted with that of an FET, where current does not propagate through the gate. SAS has a financial interest in PixelEXX, a start-up company whose mission is to market imaging arrays.

  18. Schottky Noise and Beam Transfer Functions

    Energy Technology Data Exchange (ETDEWEB)

    Blaskiewicz M.; Blaskiewicz M.

    2016-12-01

    Beam transfer functions (BTF)s encapsulate the stability properties of charged particle beams. In general one excites the beam with a sinusoidal signal and measures the amplitude and phase of the beam response. Most systems are very nearly linear and one can use various Fourier techniques to reduce the number of measurements and/or simulations needed to fully characterize the response. Schottky noise is associated with the finite number of particles in the beam. This signal is always present. Since the Schottky current drives wakefields, the measured Schottky signal is influenced by parasitic impedances.

  19. A study on the electric properties of single-junction GaAs solar cells under the combined radiation of low-energy protons and electrons

    International Nuclear Information System (INIS)

    Zhao Huijie; Wu Yiyong; Xiao Jingdong; He Shiyu; Yang Dezhuang; Sun Yanzheng; Sun Qiang; Lv Wei; Xiao Zhibin; Huang Caiyong

    2008-01-01

    Displacement damage induced by charged particle radiation is the main cause of degradation of orbital-service solar cells, while the radiation-induced ionization shows no permanent damage effect on their electrical properties. It is reported that in single crystal silicon solar cells, low-energy electron radiation does not exert permanent degradation of their properties, but the fluence of electron radiation exerts an influence on the damage magnitude under the combined radiation of protons and electrons. The electrical properties of the single-junction GaAs/Ge solar cells were investigated after irradiation by sequential and synchronous electron and proton beams. Low-energy electron radiation showed no effects on the change of the solar cell properties during sequential or synchronous irradiation, implying ionization during particle radiation could not exert influence on the displacement damage process to the solar cells under the experimental conditions

  20. Kinetics of Schottky defect formation and annihilation in single crystal TlBr.

    Science.gov (United States)

    Bishop, Sean R; Tuller, Harry L; Kuhn, Melanie; Ciampi, Guido; Higgins, William; Shah, Kanai S

    2013-07-28

    The kinetics for Schottky defect (Tl and Br vacancy pair) formation and annihilation in ionically conducting TlBr are characterized through a temperature induced conductivity relaxation technique. Near room temperature, defect generation-annihilation was found to take on the order of hours before equilibrium was reached after a step change in temperature, and that mechanical damage imparted on the sample rapidly increases this rate. The rate limiting step to Schottky defect formation-annihilation is identified as being the migration of lower mobility Tl (versus Br), with an estimate for source-sink density derived from calculated diffusion lengths. This study represents one of the first investigations of Schottky defect generation-annihilation kinetics and demonstrates its utility in quantifying detrimental mechanical damage in radiation detector materials.

  1. Status of fully integrated GaAs particle detectors

    International Nuclear Information System (INIS)

    Braunschweig, W.; Breibach, J.; Kubicki, Th.; Luebelsmeyer, K.; Maesing, Th.; Rente, C.; Roeper, Ch.; Siemes, A.

    1999-01-01

    GaAs strip detectors are of interest because of their radiation hardness at room temperature and the high absorption coefficient of GaAs for x-rays. The detectors currently under development will be used in the VLQ-experiment at the H1 experiment at the HERA collider. This will be the first high energy physics experiment where GaAs detectors will be used. The detectors have a sensitive area of 5 x 4 cm with a pitch of 62 μ m. Due to the high density of channels the biasing resistors and coupling capacitors are integrated. For the resistors a resistive layer made of Cermet is used. The properties of the first fully integrated strip detector are presented

  2. The electrical characterization and response to hydrogen of Schottky diodes with a resistive metal electrode-rectifying an oversight in Schottky diode investigation

    Energy Technology Data Exchange (ETDEWEB)

    Dawson, P; Feng, L; Penate-Quesada, L [Centre for Nanostructured Media, School of Maths and Physics, Queen' s University of Belfast, Belfast BT7 1NN (United Kingdom); Hill, G [EPSRC National Centre for III-V Technologies, Mappin Street, University ofSheffield, Sheffield S1 3JD (United Kingdom); Mitra, J, E-mail: P.dawson@qub.ac.uk

    2011-03-30

    Schottky-barrier structures with a resistive metal electrode are examined using the 4-point probe method where the probes are connected to the metal electrode only. The observation of a significant decrease in resistance with increasing temperature (over a range of {approx}100 K) in the diode resistance-temperature (R{sub D}-T) characteristic is considered due to charge carrier confinement to the metal electrode at low temperature (high resistance), with the semiconductor progressively opening up as a parallel current carrying channel (low resistance) with increasing temperature due to increasing thermionic emission across the barrier. A simple model is constructed, based on thermionic emission at quasi-zero bias, that generates good fits to the experimental data. The negative differential resistance (NDR) region in the R{sub D}-T characteristic is a general effect and is demonstrated across a broad temperature range for a variety of Schottky structures grown on Si-, GaAs- and InP-substrates. In addition the NDR effect is harnessed in micro-scaled Pd/n-InP devices for the detection of low levels of hydrogen in an ambient atmosphere of nitrogen.

  3. A comparative study of EL2 and other deep centers in undoped SI GaAs using optical absorption spectra and photoconductivity measurements

    Energy Technology Data Exchange (ETDEWEB)

    Kozlova, J.P. E-mail: jpkozlova@rbcmail.ru; Bowles, T.J.; Eremin, V.K.; Gavrin, V.N.; Koshelev, O.G.; Markov, A.V.; Morozova, V.A.; Polyakov, A.J.; Verbitskaya, E.M.; Veretenkin, E.P

    2003-10-11

    The performance of radiation detectors fabricated from semi-insulating (SI) GaAs is highly sensitive to EL2{sup +}-concentration in the material. Near-infrared optical absorption measurements are commonly used to determine the EL2-concentration and to roughly estimate the EL2{sup +}-concentration under the assumption that the optical absorption is mainly determined by the photoionization and the photoneutralization of EL2{sup 0} and EL2{sup +}, respectively. However, the presence of different native defects can contribute to optical absorption and reduce the precision of determination of EL2-concentration. In this work, we evaluate the contributions into optical absorption from EL2 and other deep center namely EL3 defect (0.55 eV) using near-infrared optical absorption and photoconductivity (PC) measurements in the photon energy interval 0.5-1.4 eV for SI GaAs crystals grown by the liquid encapsulated Czochralski method from melts with As content changing from 50% to about 46%. The photoelectrical spectra were measured on p-i-n structure detectors with heavily doped p{sup +} and n{sup +} layers grown by Liquid Phase Epitaxy and on Schottky diodes. The short circuit photocurrent spectra were registered for all detectors in the energy interval 0.65-1.4 eV. Unexpectedly, the current sensitivities in the regions of the extrinsic and intrinsic absorption were comparable. A comparative study of optical absorption, PC and short circuit photocurrent spectra resulted in determination of EL2{sup +}-concentration. It was concluded that contribution of additional deep centers, particularly the ionized EL3{sup +} defect could be comparable to the EL2-contribution. The EL3 centers were attributed to oxygen-related defects based on published results and on some indirect evidence in our experimental data.

  4. Graphite-graphene semiconductor junctions and magneto-dielectric coupling in Schottky diodes

    Science.gov (United States)

    Tongay, Sefaattin

    The goal of this dissertation is to incorporate graphite and graphene into today's semiconductor technology as a Schottky barrier diodes (metal/semiconductor junctions) that are widely used in metal semiconductor field effect transistors (MESFETs), high electron mobility transistors (HEMTs), high temperature and frequency devices, solar cells and sensors/detectors. The first part of the dissertation aims to give the reader a general idea about the physics at the metal-semiconductor junctions and essential theory background. The second chapter of the dissertation questions effects of temperature and magnetic field on the diode characteristics of Schottky junctions. In this chapter, we present observation of negative magnetocapacitance on GaAs:Si/Au junctions and fully equipped with the theory, we present a phenomenological explanation for the observed effect. In the third chapter, we for the first time introduce multi-layer-graphene as a metal (semimetal) electrode to form Schottky barriers on various technologically significant semiconductors such as Si, GaAs, SiC and GaN. Multi-layer-graphene/ semiconductor junctions not only display good current-voltage (I - V) and capacitance-voltage (C - V) characteristics but also are significant since the Schottky barrier height and characteristics are mainly governed by the interaction and bond formation at few layers on the metal and semiconductor interface. This automatically implies that the presented results also hold for graphene/semiconductor junctions. Chapter 4, takes the Schottky formation at the multi-layer-graphene(graphene)/ semiconductor junction to another level and aims to change the Fermi level of the metal electrode by intercalation with Bromine and tune the barrier height. Observed results are significant in MESFET technology since different barrier height are desired depending on the application. The remainder of the dissertation, focuses on the properties of graphite and graphene to have more

  5. Development of GaAs Detectors for Physics at the LHC

    CERN Multimedia

    Chu, Zhonghua; Krais, R; Rente, C; Syben, O; Tenbusch, F; Toporowsky, M; Xiao, Wenjiang; Cavallini, A; Fiori, F; Edwards, M; Geppert, R; Goppert, R; Haberla, C; Hornung, M F; Irsigler, R; Rogalla, M; Beaumont, S; Raine, C; Skillicorn, I; Margelevicius, J; Meshkinis, S; Smetana, S; Jones, B; Santana, J; Sloan, T; Zdansky, K; Alexiev, D; Donnelly, I J; Canali, C; Chiossi, C; Nava, F; Pavan, P; Kubasta, J; Tomiak, Z; Tchmil, V; Tchountonov, A; Tsioupa, I; Dogru, M; Gray, R; Hou, Yuqian; Manolopoulos, S; Walsh, S; Aizenshtadt, G; Budnitsky, D L; Gossen, A; Khludkov, S; Koretskaya, O B; Okaevitch, L; Potapov, A; Stepanov, V E; Tolbanov, O; Tyagev, A; Matulionis, A; Pozela, J; Kavaliauskiene, G; Kazukauskas, V; Kiliulis, R; Rinkevicius, V; Slenys, S; Storasta, J V

    2002-01-01

    % RD-8 Development of GaAs Detectors for Physics at the LHC \\\\ \\\\The aims of the collaboration are to investigate the available material options, performance and limitations of simple pad, pixel and microstrip GaAs detectors for minimum ionising particles with radiation hardness and speed which are competitive with silicon detectors. This new technology was originally developed within our university laboratories but now benefits from increasing industrial interest and collaboration in detector fabrication. Initial steps have also been taken towards the fabrication of GaAs preamplifiers to match the detectors in radiation hardness. The programme of work aims to construct a demonstration detector module for an LHC forward tracker based on GaAs.

  6. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method

    Science.gov (United States)

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C.

    2016-04-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.

  7. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method.

    Science.gov (United States)

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C

    2016-12-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.

  8. Irradiation effects on electrical properties of DNA solution/Al Schottky diodes

    Science.gov (United States)

    Al-Ta'ii, Hassan Maktuff Jaber; Periasamy, Vengadesh; Iwamoto, Mitsumasa

    2018-04-01

    Deoxyribonucleic acid (DNA) has emerged as one of the most exciting organic material and as such extensively studied as a smart electronic material since the last few decades. DNA molecules have been reported to be utilized in the fabrication of small-scaled sensors and devices. In this current work, the effect of alpha radiation on the electrical properties of an Al/DNA/Al device using DNA solution was studied. It was observed that the carrier transport was governed by electrical interface properties at the Al-DNA interface. Current ( I)-voltage ( V) curves were analyzed by employing the interface limited Schottky current equations, i.e., conventional and Cheung and Cheung's models. Schottky parameters such as ideality factor, barrier height and series resistance were also determined. The extracted barrier height of the Schottky contact before and after radiation was calculated as 0.7845, 0.7877, 0.7948 and 0.7874 eV for the non-radiated, 12, 24 and 36 mGy, respectively. Series resistance of the structure was found to decline with the increase in the irradiation, which was due to the increase in the free radical root effects in charge carriers in the DNA solution. Results pertaining to the electronic profiles obtained in this work may provide a better understanding for the development of precise and rapid radiation sensors using DNA solution.

  9. Nonequilibrium transport in GaAs Schottky mixers at 2.5 THz

    International Nuclear Information System (INIS)

    Pardo, D; Grajal, J; Pérez, S

    2015-01-01

    This work presents an analysis of the electrical and the noise performances of a 2.5 THz mixer. Reliable and self-consistent simulations of the circuit are carried out by means of a Monte Carlo model of the diode coupled to a harmonic balance technique. Simulations with this tool have shown that hot electrons and intervalley transitions can highly degrade the performance of this mixer. Additionally, these phenomena can be mitigated by decreasing the epilayer length of the diode. (paper)

  10. Solar heating of GaAs nanowire solar cells.

    Science.gov (United States)

    Wu, Shao-Hua; Povinelli, Michelle L

    2015-11-30

    We use a coupled thermal-optical approach to model the operating temperature rise in GaAs nanowire solar cells. We find that despite more highly concentrated light absorption and lower thermal conductivity, the overall temperature rise in a nanowire structure is no higher than in a planar structure. Moreover, coating the nanowires with a transparent polymer can increase the radiative cooling power by 2.2 times, lowering the operating temperature by nearly 7 K.

  11. Photovoltaic X-ray detectors based on epitaxial GaAs structures

    Energy Technology Data Exchange (ETDEWEB)

    Achmadullin, R.A. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Artemov, V.V. [Shubnikov Institute of Crystallography, Russian Academy of Sciences, 59 Leninski pr., Moscow B-333, 117333 (Russian Federation); Dvoryankin, V.F. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation)]. E-mail: vfd217@ire216.msk.su; Dvoryankina, G.G. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Dikaev, Yu.M. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Ermakov, M.G. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Ermakova, O.N. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Chmil, V.B. [Scientific State Center, High Energy Physics Institute, Protvino, Moscow region (Russian Federation); Holodenko, A.G. [Scientific State Center, High Energy Physics Institute, Protvino, Moscow region (Russian Federation); Kudryashov, A.A.; Krikunov, A.I.; Petrov, A.G.; Telegin, A.A. [Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 1 Ac. Vvedenski square, Fryazino 141190, Moscow region (Russian Federation); Vorobiev, A.P. [Scientific State Center, High Energy Physics Institute, Protvino, Moscow region (Russian Federation)

    2005-12-01

    A new type of the photovoltaic X-ray detector based on epitaxial p{sup +}-n-n'-n{sup +} GaAs structures which provides a high efficiency of charge collection in the non-bias operation mode at room temperature is proposed. The GaAs epitaxial structures were grown by vapor-phase epitaxy on heavily doped n{sup +}-GaAs(1 0 0) substrates. The absorption efficiency of GaAs X-ray detector is discussed. I-V and C-V characteristics of the photovoltaic X-ray detectors are analyzed. The built-in electric field profiles in the depletion region of epitaxial structures are measured by the EBIC method. Charge collection efficiency to {alpha}-particles and {gamma}-radiation are measured. The application of X-ray detectors is discussed.

  12. Properties of a Light-Modified-Breakdown Detector in GaAs.

    Science.gov (United States)

    Ballantyne, J M; Baukus, J P; Lavin, J M

    1973-10-01

    The properties of a bulk-effect millimeter-wave detector made from high-purity epitaxial GaAs are discussed. The devices are operated at 4.2 K in a new light-modified-breakdown (LMB) mode with dc bias above avalanche breakdown. When operated in the LMB mode as a direct video detector, circuit-limited response time (10-90% pulse) less than 20 nsec is observed, which is an order of magnitude faster than the response of bulk GaAs and InSb mixers. NEP values of less than 10(-10) W (D* on the order of 10(10)) in the video detector mode have been measured over the 10-70 GHz frequency range. The dependence of detector performance on operating parameters and frequency is given and compared with the predictions of hot-electron theory developed for InSb detectors. Its performance is also compared with that of microwave-biased InSb, thermal, pyroelectric, and photoionized-impurity GaAs detectors and with point contact, Schottky barrier, and MOM (tunneling) diodes and is shown to provide significant advantages of either burnout resistance, risetime, or noise over competitors in the millimeter spectral region.

  13. Plastic Schottky-barrier solar cells

    Science.gov (United States)

    Waldrop, J.R.; Cohen, M.J.

    1981-12-30

    A photovoltaic cell structure is fabricated from an active medium including an undoped polyacetylene, organic semiconductor. When a film of such material is in rectifying contact with a metallic area electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates a magnesium layer on the undoped polyacetylene film. With the proper selection and location of elements a photovoltaic cell structure and solar cell are obtained.

  14. Gallium Nitride Schottky betavoltaic nuclear batteries

    International Nuclear Information System (INIS)

    Lu Min; Zhang Guoguang; Fu Kai; Yu Guohao; Su Dan; Hu Jifeng

    2011-01-01

    Research highlights: → Gallium Nitride nuclear batteries with Ni-63 are demonstrated for the first time. → Open circuit voltage of 0.1 V and conversion efficiency of 0.32% have been obtained. → The limited performance is due to thin effective energy deposition layer. → The output power is expected to greatly increase with growing thick GaN films. -- Abstract: Gallium Nitride (GaN) Schottky betavoltaic nuclear batteries (GNBB) are demonstrated in our work for the first time. GaN films are grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD), and then GaN Schottky diodes are fabricated by normal micro-fabrication process. Nickel with mass number of 63 ( 63 Ni), which emits β particles, is loaded on the GaN Schottky diodes to achieve GNBB. X-ray diffraction (XRD) and photoluminescence (PL) are carried out to investigate the crystal quality for the GaN films as grown. Current-voltage (I-V) characteristics shows that the GaN Schottky diodes are not jet broken down at -200 V due to consummate fabrication processes, and the open circuit voltage of the GNBB is 0.1 V and the short circuit current density is 1.2 nA cm -2 . The limited performance of the GNBB is due to thin effective energy deposition layer, which is only 206 nm to absorb very small partial energy of the β particles because of the relatively high dislocation density and carrier concentration. However, the conversion efficiency of 0.32% and charge collection efficiency (CCE) of 29% for the GNBB have been obtained. Therefore, the output power of the GNBB are expected to greatly increase with growing high quality thick GaN films.

  15. Schottky Barriers in Bilayer Phosphorene Transistors.

    Science.gov (United States)

    Pan, Yuanyuan; Dan, Yang; Wang, Yangyang; Ye, Meng; Zhang, Han; Quhe, Ruge; Zhang, Xiuying; Li, Jingzhen; Guo, Wanlin; Yang, Li; Lu, Jing

    2017-04-12

    It is unreliable to evaluate the Schottky barrier height (SBH) in monolayer (ML) 2D material field effect transistors (FETs) with strongly interacted electrode from the work function approximation (WFA) because of existence of the Fermi-level pinning. Here, we report the first systematical study of bilayer (BL) phosphorene FETs in contact with a series of metals with a wide work function range (Al, Ag, Cu, Au, Cr, Ti, Ni, and Pd) by using both ab initio electronic band calculations and quantum transport simulation (QTS). Different from only one type of Schottky barrier (SB) identified in the ML phosphorene FETs, two types of SBs are identified in BL phosphorene FETs: the vertical SB between the metallized and the intact phosphorene layer, whose height is determined from the energy band analysis (EBA); the lateral SB between the metallized and the channel BL phosphorene, whose height is determined from the QTS. The vertical SBHs show a better consistency with the lateral SBHs of the ML phosphorene FETs from the QTS compared than that of the popular WFA. Therefore, we develop a better and more general method than the WFA to estimate the lateral SBHs of ML semiconductor transistors with strongly interacted electrodes based on the EBA for its BL counterpart. In terms of the QTS, n-type lateral Schottky contacts are formed between BL phosphorene and Cr, Al, and Cu electrodes with electron SBH of 0.27, 0.31, and 0.32 eV, respectively, while p-type lateral Schottky contacts are formed between BL phosphorene and Pd, Ti, Ni, Ag, and Au electrodes with hole SBH of 0.11, 0.18, 0.19, 0.20, and 0.21 eV, respectively. The theoretical polarity and SBHs are in good agreement with available experiments. Our study provides an insight into the BL phosphorene-metal interfaces that are crucial for designing the BL phosphorene device.

  16. Mechanism of formation of Schottky diodes

    International Nuclear Information System (INIS)

    Ponpon, J.P.; Siffert, P.

    1976-01-01

    The formation of the potential barrier at the metal-silicon contact has been investigated. Special emphazis was given to the study of ageing of gold-N type silicon Schottky diodes, showing that their electrical properties are directly correlated to oxygen diffusion through the metal. A phenomenological model based on the behavior of oxygen with respect to the metal involved is proposed to describe the ageing for any metal deposited on N or P type silicon

  17. Liaison, Schottky Problem and Invariant Theory

    CERN Document Server

    Alonso, Maria Emilia; Mallavibarrena, Raquel; Sols, Ignacio

    2010-01-01

    This volume is a homage to the memory of the Spanish mathematician Federico Gaeta (1923-2007). Apart from a historical presentation of his life and interaction with the classical Italian school of algebraic geometry, the volume presents surveys and original research papers on the mathematics he studied. Specifically, it is divided into three parts: linkage theory, Schottky problem and invariant theory. On this last topic a hitherto unpublished article by Federico Gaeta is also included.

  18. GaN nanowire Schottky barrier diodes

    OpenAIRE

    Sabui, Gourab; Zubialevich, Vitaly Z.; White, Mary; Pampili, Pietro; Parbrook, Peter J.; McLaren, Mathew; Arredondo-Arechavala, Miryam; Shen, Z. John

    2017-01-01

    A new concept of vertical gallium nitride (GaN) Schottky barrier diode based on nanowire (NW) structures and the principle of dielectric REduced SURface Field (RESURF) is proposed in this paper. High-threading dislocation density in GaN epitaxy grown on foreign substrates has hindered the development and commercialization of vertical GaN power devices. The proposed NW structure, previously explored for LEDs offers an opportunity to reduce defect density and fabricate low cost vertical GaN pow...

  19. Revised diode equation for Ideal Graphene-Semiconductor Schottky Junction

    OpenAIRE

    Liang, Shi-Jun; Ang, Lay Kee

    2015-01-01

    In this paper we carry out a theoretical and experimental study of the nature of graphene/semiconductor Schottky contact. We present a simple and parameter-free carrier transport model of graphene/semiconductor Schottky contact derived from quantum statistical theory, which is validated by the quantum Landauer theory and first-principle calculations. The proposed model can well explain experimental results for samples of different types of graphene/semiconductor Schottky contact.

  20. Oxidation of the GaAs semiconductor at the Al2O3/GaAs junction.

    Science.gov (United States)

    Tuominen, Marjukka; Yasir, Muhammad; Lång, Jouko; Dahl, Johnny; Kuzmin, Mikhail; Mäkelä, Jaakko; Punkkinen, Marko; Laukkanen, Pekka; Kokko, Kalevi; Schulte, Karina; Punkkinen, Risto; Korpijärvi, Ville-Markus; Polojärvi, Ville; Guina, Mircea

    2015-03-14

    Atomic-scale understanding and processing of the oxidation of III-V compound-semiconductor surfaces are essential for developing materials for various devices (e.g., transistors, solar cells, and light emitting diodes). The oxidation-induced defect-rich phases at the interfaces of oxide/III-V junctions significantly affect the electrical performance of devices. In this study, a method to control the GaAs oxidation and interfacial defect density at the prototypical Al2O3/GaAs junction grown via atomic layer deposition (ALD) is demonstrated. Namely, pre-oxidation of GaAs(100) with an In-induced c(8 × 2) surface reconstruction, leading to a crystalline c(4 × 2)-O interface oxide before ALD of Al2O3, decreases band-gap defect density at the Al2O3/GaAs interface. Concomitantly, X-ray photoelectron spectroscopy (XPS) from these Al2O3/GaAs interfaces shows that the high oxidation state of Ga (Ga2O3 type) decreases, and the corresponding In2O3 type phase forms when employing the c(4 × 2)-O interface layer. Detailed synchrotron-radiation XPS of the counterpart c(4 × 2)-O oxide of InAs(100) has been utilized to elucidate the atomic structure of the useful c(4 × 2)-O interface layer and its oxidation process. The spectral analysis reveals that three different oxygen sites, five oxidation-induced group-III atomic sites with core-level shifts between -0.2 eV and +1.0 eV, and hardly any oxygen-induced changes at the As sites form during the oxidation. These results, discussed within the current atomic model of the c(4 × 2)-O interface, provide insight into the atomic structures of oxide/III-V interfaces and a way to control the semiconductor oxidation.

  1. Terahertz radiation in In{sub 0.38}Ga{sub 0.62}As grown on a GaAs wafer with a metamorphic buffer layer under femtosecond laser excitation

    Energy Technology Data Exchange (ETDEWEB)

    Ponomarev, D. S., E-mail: ponomarev-dmitr@mail.ru; Khabibullin, R. A.; Yachmenev, A. E.; Maltsev, P. P. [Russian Academy of Sciences, Institute of Ultrahigh Frequency Semiconductor Electronics (Russian Federation); Grekhov, M. M. [National Research Nuclear University “MEPhI” (Russian Federation); Ilyakov, I. E.; Shishkin, B. V.; Akhmedzhanov, R. A. [Russian Academy of Sciences, Institute of Applied Physics (Russian Federation)

    2017-04-15

    The results of time-domain spectroscopy of the terahertz (THz) generation in a structure with an In{sub 0.38}Ga{sub 0.62}As photoconductive layer are presented. This structure grown by molecular-beam epitaxy on a GaAs substrate using a metamorphic buffer layer allows THz generation with a wide frequency spectrum (to 6 THz). This is due to the additional contribution of the photo-Dember effect to THz generation. The measured optical-to-terahertz conversion efficiency in this structure is 10{sup –5} at a rather low optical fluence of ~40 μJ/cm{sup 2}, which is higher than that in low-temperature grown GaAs by almost two orders of magnitude.

  2. Epitaxially grown MnAs /GaAs lateral spin valves

    Science.gov (United States)

    Saha, D.; Holub, M.; Bhattacharya, P.; Liao, Y. C.

    2006-10-01

    The authors report magnetoresistance of lateral spin valves fabricated from an epitaxially grown MnAs /GaAs heterostructure and utilizing a Schottky tunnel barrier for efficient spin injection. A coercive field difference between the two ferromagnetic MnAs contacts is obtained by a difference in aspect ratio. Peak magnetoresistances of 3.6% at 10K and 1.1% at 125K are measured for a 0.5μm channel length spin valve. The authors observe an exponential decay of the peak magnetoresistance with increasing channel length, which is indicative of diffusive spin transport. The magnetoresistance increases with increasing bias and with decreasing temperature. Control experiments have been carried out to confirm the spin-valve effect.

  3. Noise behaviour of semiinsulating GaAs particle detectors at various temperatures before and after irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Tenbusch, F.; Braunschweig, W.; Chu, Z.; Krais, R.; Kubicki, T.; Luebelsmeyer, K.; Pandoulas, D.; Rente, C.; Syben, O.; Toporowski, M.; Wittmer, B.; Xiao, W.J. [Technische Hochschule Aachen (Germany). 1. Physikalisches Inst.

    1998-02-01

    We investigated the noise behaviour of surface barrier detectors (double sided Schottky contact) made of semiinsulating GaAs. Two types of measurements were performed: equivalent noise charge (ENC) and noise power density spectra in a frequency range from 10 Hz to 500 kHz. The shape of the density spectra are a powerful tool to examine the physical origin of the noise, before irradiation it is dominated by generation-recombination processes caused by deep levels. Temperature dependent noise measurements reveal the deep level parameters like activation energy and cross section, which are also extracted by analyzing the time transients of the charge pulse from {alpha}-particles. After irradiation with protons, neutrons and pions the influence of the deep levels being originally responsible for the noise is found to decrease and a reduction of the noise over the entire frequency range with increasing fluence is observed. (orig.). 21 refs.

  4. Layer-resolved photoelectron diffraction: electron attenuation anisotropy in GaAs

    Czech Academy of Sciences Publication Activity Database

    Bartoš, Igor; Cukr, Miroslav; Jiříček, Petr

    2012-01-01

    Roč. 185, 5-7 (2012), 184-187 ISSN 0368-2048 Grant - others:AVČR(CZ) Praemium Academiae Institutional research plan: CEZ:AV0Z10100521 Keywords : low-energy electron attenuation in GaAs * layer-resolved photoelectron diffraction * synchrotron radiation Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.706, year: 2012

  5. Structural and Electrical Characterization of Oxidated, Nitridated and Oxi-nitridated (100) GaAs Surfaces

    Science.gov (United States)

    Paul, Narayan Chandra; Nakamura, Kazuki; Takebe, Masahide; Takemoto, Akira; Inokuma, Takao; Iiyama, Koichi; Takamiya, Saburo; Higashimine, Koichi; Ohtsuka, Nobuo; Yonezawa, Yasuto

    2003-07-01

    Oxidation by the UV & ozone process, nitridation by the nitrogen helicon-wave-excited plasma process, and the combination of these processes are applied to (100) GaAs wafers. An atomic force microscope, X-ray photoelectron spectroscopy, a transmission electron microscope, photoluminescence and electrical characteristics (current-voltage and capacitance-voltage) were used to analyze the influences of these processes on the structure and composition of the surfaces and the interfaces. Metal-insulator-semiconductor (MIS) diodes and Schottky diodes were fabricated in order to investigate the electrical influences of these processes. The oxidation slightly disorders GaAs surfaces. Nitridation of a bare surface creates about a 2-nm-thick strongly disordered layer, which strongly deteriorates the electrical and photoluminescence characteristics. Nitridation of oxidated wafers (oxi-nitridation) forms firm amorphous GaON layers, which contain GaN, with very flat and sharp GaON/GaAs interfaces, where crystal disorder is hardly observed. It improves the current-voltage (I-V) and capacitance-voltage (C-V) characteristics and the photoluminescence intensity. Results of the structural and the electrical characterizations qualitatively coincide well with each other.

  6. X-ray Imaging Using a Hybrid Photon Counting GaAs Pixel Detector

    CERN Document Server

    Schwarz, C; Göppert, R; Heijne, Erik H M; Ludwig, J; Meddeler, G; Mikulec, B; Pernigotti, E; Rogalla, M; Runge, K; Smith, K M; Snoeys, W; Söldner-Rembold, S; Watt, J

    1999-01-01

    The performance of hybrid GaAs pixel detectors as X-ray imaging sensors were investigated at room temperature. These hybrids consist of 300 mu-m thick GaAs pixel detectors, flip-chip bonded to a CMOS Single Photon Counting Chip (PCC). This chip consists of a matrix of 64 x 64 identical square pixels (170 mu-m x 170 mu-m) and covers a total area of 1.2 cm**2. The electronics in each cell comprises a preamplifier, a discriminator with a 3-bit threshold adjust and a 15-bit counter. The detector is realized by an array of Schottky diodes processed on semi-insulating LEC-GaAs bulk material. An IV-charcteristic and a detector bias voltage scan showed that the detector can be operated with voltages around 200 V. Images of various objects were taken by using a standard X-ray tube for dental diagnostics. The signal to noise ratio (SNR) was also determined. The applications of these imaging systems range from medical applications like digital mammography or dental X-ray diagnostics to non destructive material testing (...

  7. Failure Analysis of Heavy-Ion-Irradiated Schottky Diodes

    Science.gov (United States)

    Casey, Megan C.; Lauenstein, Jean-Marie; Wilcox, Edward P.; Topper, Alyson D.; Campola, Michael J.; Label, Kenneth A.

    2017-01-01

    In this work, we use high- and low-magnitude optical microscope images, infrared camera images, and scanning electron microscope images to identify and describe the failure locations in heavy-ion-irradiated Schottky diodes.

  8. Supersensitive, Fast-Response Nanowire Sensors by Using Schottky Contacts

    KAUST Repository

    Hu, Youfan

    2010-05-31

    A Schottky barrier can be formed at the interface between a metal electrode and a semiconductor. The current passing through the metal-semiconductor contact is mainly controlled by the barrier height and barrier width. In conventional nanodevices, Schottky contacts are usually avoided in order to enhance the contribution made by the nanowires or nanotubes to the detected signal. We present a key idea of using the Schottky contact to achieve supersensitive and fast response nanowire-based nanosensors. We have illustrated this idea on several platforms: UV sensors, biosensors, and gas sensors. The gigantic enhancement in sensitivity of up to 5 orders of magnitude shows that an effective usage of the Schottky contact can be very beneficial to the sensitivity of nanosensors. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  9. Piezotronically modified double Schottky barriers in ZnO varistors.

    Science.gov (United States)

    Raidl, Nadine; Supancic, Peter; Danzer, Robert; Hofstätter, Michael

    2015-03-25

    Double Schottky barriers in ZnO are modified piezotronically by the application of mechanical stresses. New effects such as the enhancement of the potential barrier height and the increase or decrease of the natural barrier asymmetry are presented. Also, an extended model for the piezotronic modification of double Schottky barriers is given. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  10. A fast-neutron detection detector based on fission material and large sensitive 4H silicon carbide Schottky diode detector

    Science.gov (United States)

    Liu, Linyue; Liu, Jinliang; Zhang, Jianfu; Chen, Liang; Zhang, Xianpeng; Zhang, Zhongbing; Ruan, Jinlu; Jin, Peng; Bai, Song; Ouyang, Xiaoping

    2017-12-01

    Silicon carbide radiation detectors are attractive in the measurement of the total numbers of pulsed fast neutrons emitted from nuclear fusion and fission devices because of high neutron-gamma discrimination and good radiation resistance. A fast-neutron detection system was developed based on a large-area 4H-SiC Schottky diode detector and a 235U fission target. Excellent pulse-height spectra of fission fragments induced by mono-energy deuterium-tritium (D-T) fusion neutrons and continuous energy fission neutrons were obtained. The detector is proven to be a good candidate for pulsed fast neutron detection in a complex radiation field.

  11. Impact of Gd2O3 passivation layer on interfacial and electrical properties of atomic-layer-deposited ZrO2 gate dielectric on GaAs

    Science.gov (United States)

    Gong, Youpin; Zhai, Haifa; Liu, Xiaojie; Kong, Jizhou; Wu, Di; Li, Aidong

    2014-02-01

    ZrO2 gate dielectric films were fabricated on n-GaAs substrates by atomic layer deposition (ALD), using metal organic chemical vapor deposition (MOCVD)-derived ultrathin Gd2O3 film as interfacial control layer between ZrO2 and n-GaAs. The interfacial structure, capacitance-voltage and current-voltage properties of ZrO2/n-GaAs and ZrO2/Gd2O3/n-GaAs metal-oxide-semiconductor (MOS) capacitors have been investigated. The introduction of an ultrathin Gd2O3 control layer can effectively suppress the formation of As oxides and high valence Ga oxide at the high k/GaAs interface which evidently improved the electrical properties of GaAs-based MOS capacitors, such as higher accumulation capacitance and lower leakage current density. It was found that the current conduction mechanism of MOS capacitors varied from Poole-Frenkel emission to Schottky-Richardson emission after introducing the thin Gd2O3 layer. The band alignments of interfaces for ZrO2/GaAs and ZrO2/Gd2O3/GaAs were established, which indicates that the conduction band offset (CBO) for ZrO2/GaAs and ZrO2/Gd2O3/GaAs stacks are ˜1.45 and ˜1.62 eV, correspondingly.

  12. Improved designs of Si-based quantum wells and Schottky diodes for IR detection

    International Nuclear Information System (INIS)

    Moeen, M.; Kolahdouz, M.; Salemi, A.; Abedin, A.; Östling, M.; Radamson, H.H.

    2016-01-01

    Novel structures of intrinsic or carbon-doped multi quantum wells (MQWs) and intrinsic or carbon-doped Si Schottky diodes (SD), individually or in combination, have been manufactured to detect the infrared (IR) radiation. The carbon concentration in the structures was 5 × 10 20 cm −3 and the MQWs are located in the active part of the IR detector. A Schottky diode was designed and formed as one of the contacts (based on NiSi(C)/TiW) to MQWs where on the other side the structure had an Ohmic contact. The thermal response of the detectors is expressed in terms of temperature coefficient of resistance (TCR) and the quality of the electrical signal is quantified by the signal-to-noise ratio. The noise measurements provide the K 1/f parameter which is obtained from the power spectrum density. An excellent value of TCR = − 6%/K and K 1/f = 4.7 × 10 −14 was measured for the detectors which consist of the MQWs in series with the SD. These outstanding electrical results indicate a good opportunity to manufacture low cost Si-based IR detectors in the near future. - Highlights: • SiGe (C)/Si(C) multi quantum wells (MQWs) are evaluated to detect IR radiation. • Schottky diodes (SDs), individually or in series with MQWs are also fabricated. • Detectors consisted of MQWs in series with SD show excellent thermal sensing. • The noise values are also extremely low for MQWs in series with SD.

  13. Improved designs of Si-based quantum wells and Schottky diodes for IR detection

    Energy Technology Data Exchange (ETDEWEB)

    Moeen, M., E-mail: moeen@kth.se [School of Information and Communication Technology, KTH Royal Institute of Technology, Stockholm, 16640, Kista (Sweden); Kolahdouz, M. [School of Electrical and Computer Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Salemi, A.; Abedin, A.; Östling, M. [School of Information and Communication Technology, KTH Royal Institute of Technology, Stockholm, 16640, Kista (Sweden); Radamson, H.H., E-mail: rad@kth.se [School of Information and Communication Technology, KTH Royal Institute of Technology, Stockholm, 16640, Kista (Sweden)

    2016-08-31

    Novel structures of intrinsic or carbon-doped multi quantum wells (MQWs) and intrinsic or carbon-doped Si Schottky diodes (SD), individually or in combination, have been manufactured to detect the infrared (IR) radiation. The carbon concentration in the structures was 5 × 10{sup 20} cm{sup −3} and the MQWs are located in the active part of the IR detector. A Schottky diode was designed and formed as one of the contacts (based on NiSi(C)/TiW) to MQWs where on the other side the structure had an Ohmic contact. The thermal response of the detectors is expressed in terms of temperature coefficient of resistance (TCR) and the quality of the electrical signal is quantified by the signal-to-noise ratio. The noise measurements provide the K{sub 1/f} parameter which is obtained from the power spectrum density. An excellent value of TCR = − 6%/K and K{sub 1/f} = 4.7 × 10{sup −14} was measured for the detectors which consist of the MQWs in series with the SD. These outstanding electrical results indicate a good opportunity to manufacture low cost Si-based IR detectors in the near future. - Highlights: • SiGe (C)/Si(C) multi quantum wells (MQWs) are evaluated to detect IR radiation. • Schottky diodes (SDs), individually or in series with MQWs are also fabricated. • Detectors consisted of MQWs in series with SD show excellent thermal sensing. • The noise values are also extremely low for MQWs in series with SD.

  14. High Voltage GaN Schottky Rectifiers

    Energy Technology Data Exchange (ETDEWEB)

    CAO,X.A.; CHO,H.; CHU,S.N.G.; CHUO,C.-C.; CHYI,J.-I.; DANG,G.T.; HAN,JUNG; LEE,C.-M.; PEARTON,S.J.; REN,F.; WILSON,R.G.; ZHANG,A.P.

    1999-10-25

    Mesa and planar GaN Schottky diode rectifiers with reverse breakdown voltages (V{sub RB}) up to 550V and >2000V, respectively, have been fabricated. The on-state resistance, R{sub ON}, was 6m{Omega}{center_dot} cm{sup 2} and 0.8{Omega}cm{sup 2}, respectively, producing figure-of-merit values for (V{sub RB}){sup 2}/R{sub ON} in the range 5-48 MW{center_dot}cm{sup -2}. At low biases the reverse leakage current was proportional to the size of the rectifying contact perimeter, while at high biases the current was proportional to the area of this contact. These results suggest that at low reverse biases, the leakage is dominated by the surface component, while at higher biases the bulk component dominates. On-state voltages were 3.5V for the 550V diodes and {ge}15 for the 2kV diodes. Reverse recovery times were <0.2{micro}sec for devices switched from a forward current density of {approx}500A{center_dot}cm{sup -2} to a reverse bias of 100V.

  15. Transparent electronics: Schottky barrier and heterojunction considerations

    International Nuclear Information System (INIS)

    Wager, J.F.

    2008-01-01

    Transparent electronics employs wide band gap semi-conductors which are transparent in the visible portion of the electromagnetic spectrum for the fabrication of electronic devices and circuits. Current and future transparent electronics applications require the use of wide band gap oxide semi-conductor interfaces as contacts and rectifiers, as well as for passivation and barrier-shaping layers. Modern Schottky barrier and heterojunction theory can be applied to the assessment of such interfaces, and is reviewed for this purpose from a charge transfer, energy band diagram perspective. Ideal interface formation theory is envisaged as originating from Fermi level mediated charge transfer giving rise to a macroscopic interfacial dipole, while non-ideal theory involves charge neutrality level mediated charge transfer giving rise to a microscopic interfacial dipole. This interface formation theory is applied to the problem of indium tin oxide (ITO) - zinc oxide and ITO - tin oxide interfaces, confirming their utility as injecting source-drain contacts in transparent thin-film transistors

  16. Gigantic Enhancement in Sensitivity Using Schottky Contacted Nanowire Nanosensor

    KAUST Repository

    Wei, Te-Yu

    2009-12-09

    A new single nanowire based nanosensor is demonstrated for illustrating its ultrahigh sensitivity for gas sensing. The device is composed of a single ZnO nanowire mounted on Pt electrodes with one end in Ohmic contact and the other end in Schottky contact. The Schottky contact functions as a "gate" that controls the current flowing through the entire system. By tuning the Schottky barrier height through the responsive variation of the surface chemisorbed gases and the amplification role played by the nanowire to Schottky barrier effect, an ultrahigh sensitivity of 32 000% was achieved using the Schottky contacted device operated in reverse bias mode at 275 °C for detection of 400 ppm CO, which is 4 orders of magnitude higher than that obtained using an Ohmic contact device under the same conditions. In addition, the response time and reset time have been shortened by a factor of 7. The methodology and principle illustrated in the paper present a new sensing mechanism that can be readily and extensively applied to other gas sensing systems. © 2009 American Chemical Society.

  17. Richardson-Schottky transport mechanism in ZnS nanoparticles

    Directory of Open Access Journals (Sweden)

    Hassan Ali

    2016-05-01

    Full Text Available We report the synthesis and electrical transport mechanism in ZnS semiconductor nanoparticles. Temperature dependent direct current transport measurements on the compacts of ZnS have been performed to investigate the transport mechanism for temperature ranging from 300 K to 400 K. High frequency dielectric constant has been used to obtain the theoretical values of Richardson-Schottky and Poole-Frenkel barrier lowering coefficients. Experimental value of the barrier lowering coefficient has been calculated from conductance-voltage characteristics. The experimental value of barrier lowering coefficient βexp lies close to the theoretical value of Richardson-Schottky barrier lowering coefficient βth,RS showing Richardson-Schottky emission has been responsible for conduction in ZnS nanoparticles for the temperature range studied.

  18. TCAD analysis of graphene silicon Schottky junction solar cell

    Science.gov (United States)

    Kuang, Yawei; Liu, Yushen; Ma, Yulong; Xu, Jing; Yang, Xifeng; Feng, Jinfu

    2015-08-01

    The performance of graphene based Schottky junction solar cell on silicon substrate is studied theoretically by TCAD Silvaco tools. We calculate the current-voltage curves and internal quantum efficiency of this device at different conditions using tow dimensional model. The results show that the power conversion efficiency of Schottky solar cell dependents on the work function of graphene and the physical properties of silicon such as thickness and doping concentration. At higher concentration of 1e17cm-3 for n-type silicon, the dark current got a sharp rise compared with lower doping concentration which implies a convert of electron emission mechanism. The biggest fill factor got at higher phos doping predicts a new direction for higher performance graphene Schottky solar cell design.

  19. Mott-Schottky analysis of thin ZnO films

    International Nuclear Information System (INIS)

    Windisch, Charles F. Jr.; Exarhos, Gregory J.

    2000-01-01

    Thin ZnO films, both native and doped with secondary metal ions, have been prepared by sputter deposition and also by casting from solutions containing a range of precursor salts. The conductivity and infrared reflectivity of these films are subsequently enhanced chemically following treatment in H 2 gas at 400 degree sign C or by cathodic electrochemical treatment in a neutral (pH=7) phosphate buffer solution. While Hall-type measurements usually are used to evaluate the electrical properties of such films, the present study investigated whether a conventional Mott-Schottky analysis could be used to monitor the change in concentration of free carriers in these films before and after chemical and electrochemical reduction. The Mott-Schottky approach would be particularly appropriate for electrochemically modified films since the measurements could be made in the same electrolyte used for the post-deposition electrochemical processing. Results of studies on sputtered pure ZnO films in ferricyanide solution were promising. Mott-Schottky plots were linear and gave free carrier concentrations typical for undoped semiconductors. Film thicknesses estimated from the Mott-Schottky data were also reasonably close to thicknesses calculated from reflectance measurements. Studies on solution-deposited films were less successful. Mott-Schottky plots were nonlinear, apparently due to film porosity. A combination of dc polarization and atomic force microscopy measurements confirmed this conclusion. The results suggest that Mott-Schottky analysis would be suitable for characterizing solution-deposited ZnO films only after extensive modeling was performed to incorporate the effects of film porosity on the characteristics of the space-charge region of the semiconductor. (c) 2000 American Vacuum Society

  20. Physical based Schottky barrier diode modeling for THz applications

    DEFF Research Database (Denmark)

    Yan, Lei; Krozer, Viktor; Michaelsen, Rasmus Schandorph

    2013-01-01

    In this work, a physical Schottky barrier diode model is presented. The model is based on physical parameters such as anode area, Ohmic contact area, doping profile from epitaxial (EPI) and substrate (SUB) layers, layer thicknesses, barrier height, specific contact resistance, and device...... temperature. The effects of barrier height lowering, nonlinear resistance from the EPI layer, and hot electron noise are all included for accurate characterization of the Schottky diode. To verify the diode model, measured I-V and C-V characteristics are compared with the simulation results. Due to the lack...

  1. Simulation and measurement of the resonant Schottky pickup

    Science.gov (United States)

    Zang, Yong-Dong; Wu, Jun-Xia; Zhao, Tie-Cheng; Zhang, Sheng-Hu; Mao, Rui-Shi; Xu, Hu-Shan; Sun, Zhi-Yu; Ma, Xin-Wen; Tu, Xiao-Lin; Xiao, Guo-Qing; Nolden, F.; Hülsmann, P.; Yu., A. Litvinov; Peschke, C.; Petri, P.; S. Sanjari, M.; Steck, M.

    2011-12-01

    A resonant Schottky pickup with high sensitivity, built by GSI, will be used for nuclear mass and lifetime measurement at CSRe. The basic concepts of Schottky noise signals, a brief introduction of the geometry of the detector, the transient response of the detector, and MAFIA simulated and perturbation measured results of characteristics are presented in this paper. The resonant frequency of the pickup is about 243 MHz and can be slightly changed at a range of 3 MHz. The unloaded quality factor is about 1072 and the shunt impedance is 76 kΩ. The measured results of the characteristics are in agreement with the MAFIA simulations.

  2. High breakdown voltage Au/Pt/GaN Schottky diodes

    International Nuclear Information System (INIS)

    Dang, G. T.; Zhang, A. P.; Mshewa, M. M.; Ren, F.; Chyi, J.-I.; Lee, C.-M.; Chuo, C. C.; Chi, G. C.; Han, J.; Chu, S. N. G.

    2000-01-01

    Au/Pt/GaN Schottky diode rectifiers were fabricated with reverse breakdown voltage (V RB ) up to 550 V on vertically depleting structures and >2000 V on lateral devices. The figure-of-merit (V RB ) 2 /R ON , where R ON is the on-state resistance, had values between 4.2 and 4.8 MW cm -2 . The reverse leakage currents and forward on-voltages were still somewhat higher than the theoretical minimum values, but were comparable to SiC Schottky rectifiers reported in the literature. These devices show promise for use in ultrahigh-power switches. (c) 2000 American Vacuum Society

  3. Schottky contact analysis of photovoltaic chalcopyrite thin film absorbers

    International Nuclear Information System (INIS)

    Schlenker, E.; Mertens, V.; Parisi, J.; Reineke-Koch, R.; Koentges, M.

    2007-01-01

    Current-voltage and capacitance-voltage measurements serve to analyze thermally evaporated Al Schottky contacts on Cu(In, Ga)Se 2 based photovoltaic thin film devices, either taken as grown or etched in a bromine-methanol solution. The characteristics of the Schottky contacts on the as-grown films give evidence for some dielectric layer developing between the metal and the semiconductor. Etching the semiconductor surface prior to evaporation of the Al front contact yields a pure metal-semiconductor behavior, including effects that can be attributed to an additional diode at the Mo contact. Simulations confirm the experimental results

  4. Modeling and fabrication of 4H-SiC Schottky junction

    Science.gov (United States)

    Martychowiec, A.; Pedryc, A.; Kociubiński, A.

    2017-08-01

    The rapidly growing demand for electronic devices requires using of alternative semiconductor materials, which could replace conventional silicon. Silicon carbide has been proposed for these harsh environment applications (high temperature, high voltage, high power conditions) because of its wide bandgap, its high temperature operation ability, its excellent thermal and chemical stability, and its high breakdown electric field strength. The Schottky barrier diode (SBD) is known as one of the best refined SiC devices. This paper presents prepared model, simulations and description of technology of 4H-SiC Schottky junction as well as characterization of fabricated structures. The future aim of the application of the structures is an optical detection of an ultraviolet radiation. The model section contains a comparison of two different solutions of SBD's construction. Simulations - as a crucial process of designing electronic devices - have been performed using the ATLAS device of Silvaco TCAD software. As a final result the paper shows I-V characteristics of fabricated diodes.

  5. Enhanced Plasmonic Light Absorption for Silicon Schottky-Barrier Photodetectors

    DEFF Research Database (Denmark)

    Hashemi, Mahdieh; Farzad, Mahmood Hosseini; Mortensen, N. Asger

    2013-01-01

    is transferred into hot carriers near the Schottky barrier. The proposed broadband photodetector with a bi-grating metallic structure on the silicon substrate enables to absorb 76 % of the infrared light in the metal with a 200-nm bandwidth, while staying insensitive to the incident angle. These results pave...

  6. Silicon Schottky photovoltaic diodes for solar energy conversion

    Science.gov (United States)

    Anderson, W. A.

    1975-01-01

    Various factors in Schottky barrier solar cell fabrication are evaluated in order to improve understanding of the current flow mechanism and to isolate processing variables that improve efficiency. Results of finger design, substrate resistivity, surface finishing and activation energy studies are detailed. An increased fill factor was obtained by baking of the vacuum system to remove moisture.

  7. Particle detectors based on InP Schottky diodes

    Czech Academy of Sciences Publication Activity Database

    Yatskiv, Roman; Grym, Jan

    2012-01-01

    Roč. 10, č. 7 (2012), C100051-C100055 ISSN 1748-0221 R&D Projects: GA MŠk(CZ) OC10021; GA MŠk LD12014 Institutional support: RVO:67985882 Keywords : Particle detector * High purity InP layer * Schottky diode Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 1.869, year: 2011

  8. Generation and control of polarization-entangled photons from GaAs island quantum dots by an electric field.

    Science.gov (United States)

    Ghali, Mohsen; Ohtani, Keita; Ohno, Yuzo; Ohno, Hideo

    2012-02-07

    Semiconductor quantum dots are potential sources for generating polarization-entangled photons efficiently. The main prerequisite for such generation based on biexciton-exciton cascaded emission is to control the exciton fine-structure splitting. Among various techniques investigated for this purpose, an electric field is a promising means to facilitate the integration into optoelectronic devices. Here we demonstrate the generation of polarization-entangled photons from single GaAs quantum dots by an electric field. In contrast to previous studies, which were limited to In(Ga)As quantum dots, GaAs island quantum dots formed by a thickness fluctuation were used because they exhibit a larger oscillator strength and emit light with a shorter wavelength. A forward voltage was applied to a Schottky diode to control the fine-structure splitting. We observed a decrease and suppression in the fine-structure splitting of the studied single quantum dot with the field, which enabled us to generate polarization-entangled photons with a high fidelity of 0.72 ± 0.05.

  9. Schottky barrier height control at epitaxial NiAl/GaAs(001) interfaces by means of variable bandgap interlayers

    Energy Technology Data Exchange (ETDEWEB)

    Chambers, S.A.

    1992-11-01

    Recent developments in the use of interlayers to tailor the Schottky barrier height (SBH) at a metal/GaAs interface are discussed. The goal has been to gain control of band bending in the interfacial region by modifying both the interface Fermi energy and the charge density in the depletion region. The approach has been to grow both the interlayer and the metal overlayer under ultrahigh vacuum conditions by molecular beam epitaxy, and then to determine the chemistry of interface formation, structure, and band bending by x-ray photoelectron spectroscopy and diffraction and by low-energy electron diffraction. The interface Fermi energy can be changed from the usual midgap value of 0.7--0.8 eV relative to the band edge by the use of epitaxial transition metal aluminide (TMA) overlayers such as NiAl. The unique chemistry of interface formation between this intermetallic compound and GaAs pins the Fermi level {approximately}0.3--0.4 eV above the valence band maximum, and results in a SBH of {approximately}1 eV. The SBH can be increased to {approximately}1.2 eV by the use of a wide bandgap interlayer such as AlAs. The charge density in the depletion region can be changed by growing an n{sup +}-type group IV interlayer between the TMA overlayer and GaAs substrate. Charge transfer from the interlayer to an n-type substrate reduces the space charge density, and thereby lowers the band bending and, thus, the SBH to {approximately}0.5 eV. The use of these interlayers then produces a range of SBH values of {approximately}0.7 eV, which is a significant improvement over the rather narrow range of 0.1--0.2 eV that results from conventional metallizations. The fundamental interface science that underpins these results is discussed, and an application to complementary digital GaAs circuit design that may significantly reduce gate leakage is given.

  10. Schottky barrier height control at epitaxial NiAl/GaAs(001) interfaces by means of variable bandgap interlayers

    Energy Technology Data Exchange (ETDEWEB)

    Chambers, S.A.

    1992-11-01

    Recent developments in the use of interlayers to tailor the Schottky barrier height (SBH) at a metal/GaAs interface are discussed. The goal has been to gain control of band bending in the interfacial region by modifying both the interface Fermi energy and the charge density in the depletion region. The approach has been to grow both the interlayer and the metal overlayer under ultrahigh vacuum conditions by molecular beam epitaxy, and then to determine the chemistry of interface formation, structure, and band bending by x-ray photoelectron spectroscopy and diffraction and by low-energy electron diffraction. The interface Fermi energy can be changed from the usual midgap value of 0.7--0.8 eV relative to the band edge by the use of epitaxial transition metal aluminide (TMA) overlayers such as NiAl. The unique chemistry of interface formation between this intermetallic compound and GaAs pins the Fermi level [approximately]0.3--0.4 eV above the valence band maximum, and results in a SBH of [approximately]1 eV. The SBH can be increased to [approximately]1.2 eV by the use of a wide bandgap interlayer such as AlAs. The charge density in the depletion region can be changed by growing an n[sup +]-type group IV interlayer between the TMA overlayer and GaAs substrate. Charge transfer from the interlayer to an n-type substrate reduces the space charge density, and thereby lowers the band bending and, thus, the SBH to [approximately]0.5 eV. The use of these interlayers then produces a range of SBH values of [approximately]0.7 eV, which is a significant improvement over the rather narrow range of 0.1--0.2 eV that results from conventional metallizations. The fundamental interface science that underpins these results is discussed, and an application to complementary digital GaAs circuit design that may significantly reduce gate leakage is given.

  11. Single-Crystal Y2O3 Epitaxially on GaAs(001 and (111 Using Atomic Layer Deposition

    Directory of Open Access Journals (Sweden)

    Y. H. Lin

    2015-10-01

    Full Text Available Single-crystal atomic-layer-deposited (ALD Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films 2 nm thick were epitaxially grown on molecular beam epitaxy (MBE GaAs(001-4 \\(\\times\\ 6 and GaAs(111A-2 \\(\\times\\ 2 reconstructed surfaces. The in-plane epitaxy between the ALD-oxide films and GaAs was observed using \\textit{in-situ} reflection high-energy electron diffraction in our uniquely designed MBE/ALD multi-chamber system. More detailed studies on the crystallography of the hetero-structures were carried out using high-resolution synchrotron radiation X-ray diffraction. When deposited on GaAs(001, the Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films are of a cubic phase and have (110 as the film normal, with the orientation relationship being determined: Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\(\\(110\\[\\(001\\][\\(\\overline{1}10\\]//GaAs(\\(001\\[\\(110\\][\\(1\\overline{1}0\\]. On GaAs(\\(111\\A, the Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films are also of a cubic phase with (\\(111\\ as the film normal, having the orientation relationship of Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\(\\(111\\[\\(2\\overline{1}\\overline{1}\\] [\\(01\\overline{1}\\]//GaAs (\\(111\\ [\\(\\overline{2}11\\][\\(0\\overline{1}1\\]. The relevant orientation for the present/future integrated circuit platform is (\\(001\\. The ALD-Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\/GaAs(\\(001\\-4 \\(\\times\\ 6 has shown excellent electrical properties. These include small frequency dispersion in the capacitance-voltage CV curves at accumulation of ~7% and ~14% for the respective p- and n-type samples with the measured frequencies of 1 MHz to 100 Hz. The interfacial trap density (Dit is low of ~10\\(^{12}\\ cm\\(^{−2}\\eV\\(^{−1}\\ as extracted from measured quasi-static CVs. The frequency dispersion at accumulation and the D\\(_{it}\\ are the lowest ever achieved among all the ALD-oxides on GaAs(\\(001\\.

  12. Radiation

    International Nuclear Information System (INIS)

    2013-01-01

    The chapter one presents the composition of matter and atomic theory; matter structure; transitions; origin of radiation; radioactivity; nuclear radiation; interactions in decay processes; radiation produced by the interaction of radiation with matter

  13. Photovoltaic x-ray detectors based on the GaAs epitaxial structures

    CERN Document Server

    Akhmadullin, R A; Dvoryankina, G G; Dikaev, Y M; Ermakov, M G; Ermakova, O N; Krikunov, A I; Kudryashov, A A; Petrov, A G; Telegin, A A

    2002-01-01

    The new photovoltaic detector of the X-ray radiation is proposed on the basis of the GaAs epitaxial structures, which operates with high efficiency of the charge carriers collection without shift voltage and at the room temperature. The structures are grown by the method of the gas-phase epitaxy on the n sup + -type highly-alloyed substrates. The range of sensitivity to the X-ray radiation is within the range of effective energies from 8 up to 120 keV. The detector maximum response in the current short circuit mode is determined

  14. Charge collection efficiency of GaAs detectors studied with low-energy heavy charged particles

    International Nuclear Information System (INIS)

    Bates, R.; Dolezal, Z.; Linhart, V.; O'Shea, V.; Pospisil, S.; Raine, C.; Smith, K.; Sinor, M.; Wilhelm, I.

    1999-01-01

    Epitaxially grown GaAs layers have recently been produced with sufficient thickness and low enough free carrier concentration to permit their use as radiation detectors. Initial tests have shown that the epi-material behaves as a classical semiconductor as the depletion behaviour follows the square root dependency on the applied bias. This article presents the results of measurements of the growth of the active depletion depth with increasing bias using low-energy protons and alpha particles as probes for various depths and their comparison to values extrapolated from capacitance measurements. From the proton and alpha particle spectroscopic measurements, an active depth of detector material that collects 100% of the charge generated inside it was determined. The consistency of these results with independent capacitance measurements supports the idea that the GaAs epi-material behaves as a classical semiconductor. (author)

  15. Transmission electron microscopy and electrical properties measurements of laser doped silicon and GaAs

    International Nuclear Information System (INIS)

    Young, R.T.; Narayan, J.; Westbrook, R.D.; Wood, R.F.

    1978-12-01

    High quality silicon p-n junctions have been prepared by alloying a vacuum evaporated Al film into n-type Si and by epitaxial regrowth of an As doped Si amorphous layer onto p-type (100) Si by a single short pulse of ruby laser radiation. Transmission electron microscopy investigations indicated that a defect-free epitaxial layer was grown on the (100) Si surface; however, some polycrystalline structure in the very near-surface region was observed, which does not seem to affect the junction characteristics. Laser assisted junction formation in GaAs was demonstrated by alloying Mg films into n-type GaAs; however, diode characteristics show a large leakage current which may have been caused by the surface damage

  16. Electrons, holes, and excitons in GaAs polytype quantum dots

    Energy Technology Data Exchange (ETDEWEB)

    Climente, Juan I.; Segarra, Carlos; Rajadell, Fernando; Planelles, Josep, E-mail: josep.planelles@uji.es [Departament de Química Física i Analítica, Universitat Jaume I, E-12080 Castelló (Spain)

    2016-03-28

    Single and multi-band k⋅p Hamiltonians for GaAs crystal phase quantum dots are used to assess ongoing experimental activity on the role of such factors as quantum confinement, spontaneous polarization, valence band mixing, and exciton Coulomb interaction. Spontaneous polarization is found to be a dominating term. Together with the control of dot thickness [Vainorius et al., Nano Lett. 15, 2652 (2015)], it enables wide exciton wavelength and lifetime tunability. Several new phenomena are predicted for small diameter dots [Loitsch et al., Adv. Mater. 27, 2195 (2015)], including non-heavy hole ground state, strong hole spin admixture, and a type-II to type-I exciton transition, which can be used to improve the absorption strength and reduce the radiative lifetime of GaAs polytypes.

  17. A novel physical parameter extraction approach for Schottky diodes

    International Nuclear Information System (INIS)

    Wang Hao; Chen Xing; Xu Guang-Hui; Huang Ka-Ma

    2015-01-01

    Parameter extraction is an important step for circuit simulation methods that are based on physical models of semiconductor devices. A novel physical parameter extraction approach for Schottky diodes is proposed in this paper. By employing a set of analytical formulas, this approach extracts all of the necessary physical parameters of the diode chip in a unique way. It then extracts the package parasitic parameters with a curve-fitting method. To validate the proposed approach, a model HSMS-282c commercial Schottky diode is taken as an example. Its physical parameters are extracted and used to simulate the diode’s electrical characteristics. The simulated results based on the extracted parameters are compared with the measurements and a good agreement is obtained, which verifies the feasibility and accuracy of the proposed approach. (paper)

  18. A novel physical parameter extraction approach for Schottky diodes

    Science.gov (United States)

    Wang, Hao; Chen, Xing; Xu, Guang-Hui; Huang, Ka-Ma

    2015-07-01

    Parameter extraction is an important step for circuit simulation methods that are based on physical models of semiconductor devices. A novel physical parameter extraction approach for Schottky diodes is proposed in this paper. By employing a set of analytical formulas, this approach extracts all of the necessary physical parameters of the diode chip in a unique way. It then extracts the package parasitic parameters with a curve-fitting method. To validate the proposed approach, a model HSMS-282c commercial Schottky diode is taken as an example. Its physical parameters are extracted and used to simulate the diode’s electrical characteristics. The simulated results based on the extracted parameters are compared with the measurements and a good agreement is obtained, which verifies the feasibility and accuracy of the proposed approach. Project supported by the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. U1230112).

  19. Graphene/silicon nanowire Schottky junction for enhanced light harvesting.

    Science.gov (United States)

    Fan, Guifeng; Zhu, Hongwei; Wang, Kunlin; Wei, Jinquan; Li, Xinming; Shu, Qinke; Guo, Ning; Wu, Dehai

    2011-03-01

    Schottky junction solar cells are assembled by directly coating graphene films on n-type silicon nanowire (SiNW) arrays. The graphene/SiNW junction shows enhanced light trapping and faster carrier transport compared to the graphene/planar Si structure. With chemical doping, the SiNW-based solar cells showed energy conversion efficiencies of up to 2.86% at AM1.5 condition, opening a possibility of using graphene/semiconductor nanostructures in photovoltaic application.

  20. Electrical properties of quasi-vertical Schottky diodes

    International Nuclear Information System (INIS)

    Witte, W; Fahle, D; Koch, H; Heuken, M; Kalisch, H; Vescan, A

    2012-01-01

    In this paper, we report on quasi-vertical Schottky diodes on GaN on sapphire focusing on the influence of Ni/Au Schottky contact annealing and the doping concentration of the n-GaN onto their electrical properties. Schottky contact annealing is shown to improve the metal–semiconductor interface, as reflected in reduced ideality factor and increased barrier height. Additionally, a decrease of leakage currents and a drastic improvement of the breakdown field are achieved. The annealing temperature is shown to have an optimum value around 400 °C beyond which the device degrades. Further reduction of reverse leakage currents and an increase in breakdown voltage are achieved by decreasing the doping concentration in the n-GaN epitaxial layer. So far, a doping concentration of 2 × 10 16 cm −3 showed the best results in terms of series resistance and breakdown behavior with R on = 1 mΩ cm 2 and V Br = 230 V. (paper)

  1. Silicide Schottky Contacts to Silicon: Screened Pinning at Defect Levels

    Energy Technology Data Exchange (ETDEWEB)

    Drummond, T.J.

    1999-03-11

    Silicide Schottky contacts can be as large as 0.955 eV (E{sub v} + 0.165 eV) on n-type silicon and as large as 1.05 eV (E{sub c} {minus} 0.07 eV) on p-type silicon. Current models of Schottky barrier formation do not provide a satisfactory explanation of occurrence of this wide variation. A model for understanding Schottky contacts via screened pinning at defect levels is presented. In the present paper it is shown that most transition metal silicides are pinned approximately 0.48 eV above the valence band by interstitial Si clusters. Rare earth disilicides pin close to the divacancy acceptor level 0.41 eV below the conduction band edge while high work function silicides of Ir and Pt pin close to the divacancy donor level 0.21 eV above the valence band edge. Selection of a particular defect pinning level depends strongly on the relative positions of the silicide work function and the defect energy level on an absolute energy scale.

  2. Metal-semiconductor Schottky barrier junctions and their applications

    CERN Document Server

    1984-01-01

    The present-day semiconductor technology would be inconceivable without extensive use of Schottky barrier junctions. In spite of an excellent book by Professor E.H. Rhoderick (1978) dealing with the basic principles of metal­ semiconductor contacts and a few recent review articles, the need for a monograph on "Metal-Semiconductor Schottky Barrier Junctions and Their Applications" has long been felt by students, researchers, and technologists. It was in this context that the idea of publishing such a monograph by Mr. Ellis H. Rosenberg, Senior Editor, Plenum Publishing Corporation, was considered very timely. Due to the numerous and varied applications of Schottky barrier junctions, the task of bringing it out, however, looked difficult in the beginning. After discussions at various levels, it was deemed appropriate to include only those typical applications which were extremely rich in R&D and still posed many challenges so that it could be brought out in the stipulated time frame. Keeping in view the la...

  3. Results from the SPS 1.7 GHz travelling wave schottky monitor

    CERN Document Server

    Castro, M E; Kroyer, T; Jones, R; Koutchouk, Jean-Pierre; Tranquille, G

    2005-01-01

    A 1.7 GHz waveguide Schottky detector system was recently built and installed in the SPS accelerator following the design of the detectors of the Fermilab Tevatron and Recycler accelerators. The waveguide detector is designed to measure the transverse and longitudinal Schottky signals of the accelerator at a frequency high enough to avoid coherent effects. This paper describes the first tests carried out with the Schottky detector using LHC type beams. The principal goal of these tests was to check whether such a detector can be used for transverse Schottky diagnostics in LHC.

  4. Optimal indium-gallium-nitride Schottky-barrier thin-film solar cells

    Science.gov (United States)

    Anderson, Tom H.; Lakhtakia, Akhlesh; Monk, Peter B.

    2017-08-01

    A two-dimensional model was developed to simulate the optoelectronic characteristics of indium-gallium-nitride (InξGa1-ξN), thin-film, Schottky-barrier-junction solar cells. The solar cell comprises a window designed to reduce the reflection of incident light, Schottky-barrier and ohmic front electrodes, an n-doped InξGa1-ξN wafer, and a metallic periodically corrugated back-reflector (PCBR). The ratio of indium to gallium in the wafer varies periodically in the thickness direction, and thus the optical and electrical constitutive properties of the alloy also vary periodically. This material nonhomogeneity could be physically achieved by varying the fractional composition of indium and gallium during deposition. Empirical models for indium nitride and gallium nitride, combined with Vegard's law, were used to calculate the optical and electrical constitutive properties of the alloy. The periodic nonhomogeneity aids charge separation and, in conjunction with the PCBR, enables incident light to couple to multiple surface plasmon-polariton waves and waveguide modes. The profile of the resulting chargecarrier-generation rate when the solar cell is illuminated by the AM1.5G spectrum was calculated using the rigorous coupled-wave approach. The steady-state drift-diffusion equations were solved using COMSOL, which employs finite-element methods, to calculate the current density as a function of the voltage. Mid-band Shockley- Read-Hall, Auger, and radiative recombination rates were taken to be the dominant methods of recombination. The model was used to study the effects of the solar-cell geometry and the shape of the periodic material nonhomogeneity on efficiency. The solar-cell efficiency was optimized using the differential evolution algorithm.

  5. Panel fabrication utilizing GaAs solar cells

    Science.gov (United States)

    Mardesich, N.

    1984-01-01

    The development of the GaAs solar cells for space applications is described. The activities in the fabrication of GaAs solar panels are outlined. Panels were fabricated while introducing improved quality control, soldering laydown and testing procedures. These panels include LIPS II, San Marco Satellite, and a low concentration panel for Rockwells' evaluation. The panels and their present status are discussed.

  6. Optical pumping of hot phonons in GaAs

    International Nuclear Information System (INIS)

    Collins, C.L.; Yu, P.Y.

    1982-01-01

    Optical pumping of hot LO phonons in GaAs has been studied as a function of the excitation photon frequency. The experimental results are in good agreement with a model calculation which includes both inter- and intra-valley electron-phonon scatterings. The GAMMA-L and GAMMA-X intervalley electron-phonon interactions in GaAs have been estimated

  7. In-situ transport and microstructural evolution in GaN Schottky diodes and epilayers exposed to swift heavy ion irradiation

    Science.gov (United States)

    Kumar, Ashish; Singh, R.; Kumar, Parmod; Singh, Udai B.; Asokan, K.; Karaseov, Platon A.; Titov, Andrei I.; Kanjilal, D.

    2018-04-01

    A systematic investigation of radiation hardness of Schottky barrier diodes and GaN epitaxial layers is carried out by employing in-situ electrical resistivity and cross sectional transmission electron microscopy (XTEM) microstructure measurements. The change in the current transport mechanism of Au/n-GaN Schottky barrier diodes due to irradiation is reported. The role of irradiation temperature and ion type was also investigated. Creation of damage is studied in low and medium electron energy loss regimes by selecting different ions, Ag (200 MeV) and O (100 MeV) at various fluences at two irradiation temperatures (80 K and 300 K). GaN resistivity increases up to 6 orders of magnitude under heavy Ag ions. Light O ion irradiation has a much lower influence on sheet resistance. The presence of isolated defect clusters in irradiated GaN epilayers is evident in XTEM investigation which is explained on the basis of the thermal spike model.

  8. Peeled film GaAs solar cell development

    Science.gov (United States)

    Wilt, D. M.; Thomas, R. D.; Bailey, S. G.; Brinker, D. J.; Deangelo, F. L.

    1990-01-01

    Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid. The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide window and antireflective coating, had a Voc of 874 mV and a fill factor of 68 percent under AM0 illumination.

  9. Peeled film GaAs solar cell development

    Science.gov (United States)

    Wilt, D. M.; Thomas, R. D.; Bailey, S. G.; Brinker, D. J.; Deangelo, F. L.

    Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid. The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide window and antireflective coating, had a Voc of 874 mV and a fill factor of 68 percent under AM0 illumination.

  10. Ion implanted GaAs microwave FET's

    Science.gov (United States)

    Gill, S. S.; Blockley, E. G.; Dawsey, J. R.; Foreman, B. J.; Woodward, J.; Ball, G.; Beard, S. J.; Gaskell, J. M.; Allenson, M. B.

    1988-06-01

    The combination of ion implantation and photolithographic patterning techniques was applied to the fabrication of GaAs microwave FETs to provide a large number of devices having consistently predictable dc and high frequency characteristics. To validate the accuracy and repeatability of the high frequency device parameters, an X-band microwave circuit was designed and realized. The performance of this circuit, a buffered amplifier, is very close to the design specification. The availability of a large number of reproducible, well-characterized transistors enabled work to commence on the development of a large signal model for FETs. Work in this area is also described.

  11. An Ultra-Wideband Schottky Diode Based Envelope Detector for 2.5 Gbps signals

    DEFF Research Database (Denmark)

    Cimoli, Bruno; Valdecasa, Guillermo Silva; Granja, Angel Blanco

    2016-01-01

    In this paper an ultra-wideband (UWB) Schottky diode based envelope detector is reported. The detector consists of an input matching network, a Schottky diode and wideband output filtering network. The output network is tailored to demodulate ultra-wideband amplitude shift keying (ASK) signals up...

  12. Deep-level transient spectroscopy on an amorphous InGaZnO4 Schottky diode

    NARCIS (Netherlands)

    Chasin, A.; Simoen, E.; Bhoolokam, A.; Nag, M.; Genoe, J.; Gielen, G.; Heremans, P.

    2014-01-01

    The first direct measurement is reported of the bulk density of deep states in amorphous IGZO (indium-gallium-zinc oxide) semiconductor by means of deep-level transient spectroscopy (DLTS). The device under test is a Schottky diode of amorphous IGZO semiconductor on a palladium (Pd) Schottky-barrier

  13. Barrier characteristics of Pt/Ru Schottky contacts on n-type GaN ...

    Indian Academy of Sciences (India)

    Keywords. Pt/Ru Schottky rectifiers; -type GaN; temperature–dependent electrical properties; inhomogeneous barrier heights; double Gaussian distribution. Abstract. We have investigated the current–voltage (–) and capacitance–voltage (–) characteristics of Ru/Pt/-GaN Schottky diodes in the temperature range ...

  14. Transformation of polycrystalline tungsten to monocrystalline tungsten W(100) and its potential application in Schottky emitters

    NARCIS (Netherlands)

    Dokania, A.K.; Hendrikx, R.; Kruit, P.

    2009-01-01

    The electron sources in electron microscopes and electron lithography machines often consist of small diameter W(100) wires, etched to form a sharp tip. The electron emission is facilitated by the Schottky effect, thus the name Schottky emitter. The authors are investigating the feasibility of

  15. Band structure, band offsets, substitutional doping, and Schottky barriers of bulk and monolayer InSe

    Science.gov (United States)

    Guo, Yuzheng; Robertson, John

    2017-09-01

    We present a detailed study of the electronic structure of the layered semiconductor InSe. We calculate the band structure of the monolayer and bulk material using density functional theory, hybrid functionals, and G W . The band gap of the monolayer InSe is calculated to be 2.4 eV in screened exchange hybrid functional, close to the experimental photoluminescence gap. The electron affinities and band offsets are calculated for vertical stacked-layer heterostructures, and are found to be suitable for tunnel field effect transistors (TFETs) in combination with WS e2 or similar. The valence-band edge of InSe is calculated to lie 5.2 eV below the vacuum level, similar to that for the closed shell systems HfS e2 or SnS e2 . Hence InSe would be suitable to act as a p -type drain in the TFET. The intrinsic defects are calculated. For Se-rich layers, the Se adatom (interstitial) is found to be the most stable defect, whereas for In-rich layers, the Se vacancy is the most stable for the neutral state. Antisites tend to have energies just above those of vacancies. The Se antisite distorts towards a bond-breaking distortion as in the EL2 center of GaAs. Both substitutional donors and acceptors are calculated to be shallow, and effective dopants. They do not reconstruct to form nondoping configurations as occurs in black phosphorus. Finally, the Schottky barriers of metals on InSe are found to be strongly pinned by metal induced gap states (MIGS) at ˜0.5 eV above the valence-band edge. Any interfacial defects would lead to a stronger pinning at a similar energy. Overall, InSe is an effective semiconductor combining the good features of 2D (lack of dangling bonds, etc.) with the good features of 3D (effective doping), which few others achieve.

  16. Formation of Schottky junctions in silicon by ion implantation

    International Nuclear Information System (INIS)

    Bollmann, J.; Klose, H.; Mertens, A.

    1986-01-01

    In order to study the direct formation of a rectifying contact with Schottky junction properties low-energy high-dose silver ion implantations (E = 10 keV, D = 6 x 10 16 cm -2 ) were carried out in Czochralski-grown n- and p-type silicon (0.01 to 15 Ωcm) at 77 and 300 K, respectively. After the implantation an Al or Ag film was vacuum deposited in the same target chamber. The process-induced deep defect centers as well as their depth distribution and annealing behaviour were investigated by measuring electrical characteristics and deep level transient spectra

  17. ICTS measurements for p-GaN Schottky contacts

    Science.gov (United States)

    Shiojima, Kenji; Sugitani, Suehiro; Sakai, Shiro

    2002-05-01

    High-temperature isothermal capacitance transient spectroscopy (H-ICTS) measurements were conducted to characterize near mid-gap defects, which are the origin of the memory effect in Ni/p-GaN Schottky contacts. A large single peak was detected only under the forward bias conditions. This indicates that the defects were located in the vicinity of the interface. The change of the peak height and position of the ICTS curves under various bias conditions were qualitatively interpreted by the distribution of the defects and the current flow effect.

  18. Surface-related reduction of photoluminescence in GaAs quantum wires and its recovery by new passivation

    International Nuclear Information System (INIS)

    Shiozaki, Nanako; Anantathanasarn, Sanguan; Sato, Taketomo; Hashizume, Tamotsu; Hasegawa, Hideki

    2005-01-01

    Etched GaAs quantum wires (QWRs) and selectively grown (SG) QWRs were fabricated, and dependence of their photoluminescence (PL) properties on QWR width (W) and QWR distance to surface (d) were investigated. PL intensity greatly reduced with reduction of W and d, due to non-radiative recombination through surface states. Surface passivation by growing a Si interface control layer (Si-ICL) on group III-terminated surfaces greatly improved PL properties

  19. Preliminary measurements of gamma ray effects on characteristics of broad-band GaAs field-effect transistor preamplifiers

    International Nuclear Information System (INIS)

    Jackson, H.G.; Shimizu, T.T.; Leskovar, B.

    1985-01-01

    The effect of gamma radiation on electrical characteristics of cryogenically cooled broad-band low-noise microwave preamplifiers has been preliminarily evaluated. The change in the gain and noise figure of a 1-2 GHz preamplifier using GaAs microwave transistors was determined at gamma doses between 10 5 rad to 5 /times/ 10 8 rad. The gain and noise figure was measured at ambient temperatures of 300 K and 80 K. 8 refs., 2 figs

  20. The development of integrated chemical microsensors in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    CASALNUOVO,STEPHEN A.; ASON,GREGORY CHARLES; HELLER,EDWIN J.; HIETALA,VINCENT M.; BACA,ALBERT G.; HIETALA,S.L.

    1999-11-01

    Monolithic, integrated acoustic wave chemical microsensors are being developed on gallium arsenide (GaAs) substrates. With this approach, arrays of microsensors and the high frequency electronic components needed to operate them reside on a single substrate, increasing the range of detectable analytes, reducing overall system size, minimizing systematic errors, and simplifying assembly and packaging. GaAs is employed because it is both piezoelectric, a property required to produce the acoustic wave devices, and a semiconductor with a mature microelectronics fabrication technology. Many aspects of integrated GaAs chemical sensors have been investigated, including: surface acoustic wave (SAW) sensors; monolithic SAW delay line oscillators; GaAs application specific integrated circuits (ASIC) for sensor operation; a hybrid sensor array utilizing these ASICS; and the fully monolithic, integrated SAW array. Details of the design, fabrication, and performance of these devices are discussed. In addition, the ability to produce heteroepitaxial layers of GaAs and aluminum gallium arsenide (AlGaAs) makes possible micromachined membrane sensors with improved sensitivity compared to conventional SAW sensors. Micromachining techniques for fabricating flexural plate wave (FPW) and thickness shear mode (TSM) microsensors on thin GaAs membranes are presented and GaAs FPW delay line and TSM resonator performance is described.

  1. Defects introduced by Ar plasma exposure in GaAs probed by monoenergetic positron beam

    Energy Technology Data Exchange (ETDEWEB)

    Uedono, Akira; Tanigawa, Shoichiro [Tsukuba Univ., Ibaraki (Japan). Inst. of Materials Science; Kawano, Takao; Wada, Kazumi; Nakanishi, Hideo

    1994-10-01

    Ar-plasma-induced defects in n-type GaAs were probed by a monoenergetic positron beam. The depth distribution of the defects was obtained from measurements of Doppler broadening profiles of the annihilation radiation as a function of incident positron energy. The damaged layer induced by the exposure was found to extend far beyond the stopping range of Ar ions, and the dominant defects were identified as interstitial-type defects. After 100degC annealing, such defects were annealed. Instead, vacancy-type defects were found to be the dominant defects in the subsurface region. (author).

  2. Schottky barrier parameters and structural properties of rapidly annealed Zr Schottky electrode on p-type GaN

    Science.gov (United States)

    Rajagopal Reddy, V.; Asha, B.; Choi, Chel-Jong

    2017-06-01

    The Schottky barrier junction parameters and structural properties of Zr/p-GaN Schottky diode are explored at various annealing temperatures. Experimental analysis showed that the barrier height (BH) of the Zr/p-GaN Schottky diode increases with annealing at 400 °C (0.92 eV (I-V)/1.09 eV (C-V)) compared to the as-deposited one (0.83 eV (I-V)/0.93 eV (C-V)). However, the BH decreases after annealing at 500 °C. Also, at different annealing temperatures, the series resistance and BH are assessed by Cheung's functions and their values compared. Further, the interface state density (N SS) of the diode decreases after annealing at 400 °C and then somewhat rises upon annealing at 500 °C. Analysis reveals that the maximum BH is obtained at 400 °C, and thus the optimum annealing temperature is 400 °C for the diode. The XPS and XRD analysis revealed that the increase in BH may be attributed to the creation of Zr-N phases with increasing annealing up to 400 °C. The BH reduces for the diode annealed at 500 °C, which may be due to the formation of Ga-Zr phases at the junction. The AFM measurements reveal that the overall surface roughness of the Zr film is quite smooth during rapid annealing process. Project supported by the R&D Program for Industrial Core Technology (No. 10045216) and the Transfer Machine Specialized Lighting Core Technology Development Professional Manpower Training Project (No. N0001363) Funded by the Ministry of Trade, Industry and Energy (MOTIE), Republic of Korea.

  3. 60Co gamma irradiation effects on the the capacitance and conductance characteristics of Au/PMI/n-Si Schottky diodes

    Science.gov (United States)

    Tuğluoğlu, N.; Karadeniz, S.; Yüksel, Ö. F.; Şafak, H.; Kuş, M.

    2015-08-01

    In this work, the perylene-monoimide/n-Si (100) Schottky structures have been fabricated by spin coating process. We have studied the capacitance-voltage ( C- V) and conductance-voltage ( G- V) characteristics of the Au/perylene-monoimide/n-Si diodes at 500 kHz before and after 60Co γ-ray irradiation. The effects of 60Co γ -ray irradiation on the electrical characteristics of a perylene-monoimide/n-Si Schottky diode have been investigated. A decrease both in the capacitance and conductance has been observed after 60Co γ -ray irradiation. This has been attributed to a decrease in the net ionized dopant concentration that occurred as a result of 60Co γ-ray irradiation. Some contact parameters such as barrier height (Φ B ) interface state density ( N ss ) and series resistance ( R s ) have been calculated from the C- V and G- V characteristics of the diode before and after irradiation. It has been observed that the Φ B and N ss values are decreased after the applied radiation, while the R s value is increased.

  4. Effects of 5.4 MeV alpha-particle irradiation on the electrical properties of nickel Schottky diodes on 4H–SiC

    Energy Technology Data Exchange (ETDEWEB)

    Omotoso, E. [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa); Department of Physics, Obafemi Awolowo University, Ile-Ife 220005 (Nigeria); Meyer, W.E.; Auret, F.D.; Paradzah, A.T.; Diale, M.; Coelho, S.M.M.; Janse van Rensburg, P.J.; Ngoepe, P.N.M. [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa)

    2015-12-15

    Current–voltage, capacitance–voltage and conventional deep level transient spectroscopy at temperature ranges from 40 to 300 K have been employed to study the influence of alpha-particle irradiation from an {sup 241}Am source on Ni/4H–SiC Schottky contacts. The nickel Schottky barrier diodes were resistively evaporated on n-type 4H–SiC samples of doping density of 7.1 × 10{sup 15} cm{sup −3}. It was observed that radiation damage caused an increase in ideality factors of the samples from 1.04 to 1.07, an increase in Schottky barrier height from 1.25 to 1.31 eV, an increase in series resistance from 48 to 270 Ω but a decrease in saturation current density from 55 to 9 × 10{sup −12} A m{sup −2} from I–V plots at 300 K. The free carrier concentration of the sample decreased slightly after irradiation. Conventional DLTS showed peaks due to four deep levels for as-grown and five deep levels after irradiation. The Richardson constant, as determined from a modified Richardson plot assuming a Gaussian distribution of barrier heights for the as-grown and irradiated samples were 133 and 151 A cm{sup −2} K{sup −2}, respectively. These values are similar to literature values.

  5. The nature of electrical interaction of Schottky contacts

    International Nuclear Information System (INIS)

    Torkhov, N. A.

    2011-01-01

    Electrical interaction between metal-semiconductor contacts combined in a diode matrix with a Schottky barrier manifests itself in an appreciable variation in their surface potentials and static current-volt-characteristics. The necessary condition for appearance of electrical interaction between such contacts consists in the presence of a peripheral electric field (a halo) around them; this field propagates to a fairly large distances ( i,j ), concentration of doping impurities in the semiconductor N D , and physical nature of a metal-semiconductor system with a Schottky barrier (with the barrier height φ b ). It is established that bringing the contacts closer leads to a relative decrease in the threshold value of the “dead” zone in the forward current-voltage characteristics, an increase in the effective height of the barrier, and an insignificant increase in the nonideality factor. An increase in the total area of contacts (a total electric charge in the space charge region) in the matrix brings about an increase in the threshold value of the “dead” zone, a relative decrease in the effective barrier height, and an insignificant increase in the ideality factor.

  6. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    International Nuclear Information System (INIS)

    Hathwar, Raghuraj; Dutta, Maitreya; Chowdhury, Srabanti; Goodnick, Stephen M.; Koeck, Franz A. M.; Nemanich, Robert J.

    2016-01-01

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco ® Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures

  7. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    Science.gov (United States)

    Hathwar, Raghuraj; Dutta, Maitreya; Koeck, Franz A. M.; Nemanich, Robert J.; Chowdhury, Srabanti; Goodnick, Stephen M.

    2016-06-01

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco® Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures

  8. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    Energy Technology Data Exchange (ETDEWEB)

    Hathwar, Raghuraj; Dutta, Maitreya; Chowdhury, Srabanti; Goodnick, Stephen M. [Department of Electrical Engineering, Arizona State University, Tempe, Arizona 85287-8806 (United States); Koeck, Franz A. M.; Nemanich, Robert J. [Department of Physics, Arizona State University, Tempe, Arizona 85287-8806 (United States)

    2016-06-14

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco{sup ®} Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures.

  9. Schottky Barrier Transport for Multiphase Gallium Nitride Nanowire

    Science.gov (United States)

    Hartz, Steven; Xie, Kan; Liu, Zhun; Ayres, Virginia

    2013-03-01

    Our group has shown that gallium nitride nanowires grown by catalyst-free vapor deposition at 850oC have multiple internal crystalline regions that may be zinc blende or wurtzite phase. Stability is enabled by one or more totally coherent (0001)/(111) internal interfaces. Cross-section HRTEM has further demonstrated that, while the transverse nanowire profile appears triangular, it is actually made up of two or more surface orientations corresponding to the multi-phase internal regions. We present results of a transport investigation of these multiphase nanowires within a nanoFET circuit architecture, focusing on injection from the contacts into the nanowires. Experimental results demonstrated that a variety of surface state derived Schottky barriers could be present at the contact-nanowire interfaces. Transport across the Schottky barriers was modeled using a combined thermionic emission-tunnelling approach, leading to information about barrier height, carrier concentrations, and expected temperature behavior. The experimental and theoretical results indicate that with optimal design taking surface and internal structures into account, high current densities can be supported.

  10. Dose Rate Linearity in 4H-SiC Schottky Diode-Based Detectors at Elevated Temperatures

    Science.gov (United States)

    Mohamed, N. S.; Wright, N. G.; Horsfall, A. B.

    2017-07-01

    The outstanding material properties make silicon carbide radiation hard and this ability has enabled it to be demonstrated in a range of detector structures for deployment in extreme environments, including those where the ability to tolerate high radiation dose is imperative. This includes applications in space and nuclear environments, where the ability to detect highly energetic radiation is important. In contrast, detectors used in medical treatment, such as imaging and radiotherapy, use a range of radiation dose rates and energies for both particulate and photonic radiation. Here, we report the response and dose rate linearity of detectors fabricated from silicon carbide to dose rates in the range of 0.185 mGy · min-1, typical of those used for medical imaging. The data show that the radiation detected current originates within the depletion region of the detector and that the response is linearly dependent on the volume of the space charge region. The realization of a vertical detector structure, coupled with the high quality of epitaxial layers, has resulted in a high dose sensitivity of the detector that is highly linear. The temperature dependence of the characteristics indicates that silicon carbide Schottky diode-based detectors offer a performance suitable for medical applications at temperatures below 100 °C without the need for external cooling.

  11. Preparation of GaAs photocathodes at low temperature

    International Nuclear Information System (INIS)

    Mulhollan, G.; Clendenin, J.; Tang, H.

    1996-10-01

    The preparation of an atomically clean surface is a necessary step in the formation of negative electron affinity (NEA) GaAs. Traditional methods to this end include cleaving, heat cleaning and epitaxial growth. Cleaving has the advantage of yielding a fresh surface after each cleave, but is limited to small areas and is not suitable for specialized structures. Heat cleaning is both simple and highly successful, so it is used as a preparation method in virtually all laboratories employing a NEA source on a regular basis. Due to its high cost and complexity, epitaxial growth of GaAs with subsequent in vacuo transfer is not a practical solution for most end users of GaAs as a NEA electron source. While simple, the heating cleaning process has a number of disadvantages. Here, a variety of cleaning techniques related to preparation of an atomically clean GaAs surface without heating to 600 C are discussed and evaluated

  12. Diffusion of $^{52}$Mn in GaAs

    CERN Multimedia

    2002-01-01

    Following our previous diffusion studies performed with the modified radiotracer technique, we propose to determine the diffusion of Mn in GaAs under intrinsic conditions in a previously un-investigated temperature region. The aim of the presently proposed experiments is twofold. \\begin{itemize} \\item A quantitative study of Mn diffusion in GaAs at low Mn concentrations would be decisive in providing new information on the diffusion mechanism involved. \\item As Ga vacancies are expected to be involved in the Mn diffusion process it can be predicted that also the GaAs material growth technique most likely plays a role. To clarify this assumption diffusion experiments will be conducted for GaAs material grown by two different techniques. \\end{itemize} For such experiments we ask for two runs of 3 shifts (total of 6 shifts) with $^{52}$Mn$^{+}$ ion beam.

  13. Schottky bipolar I-MOS: An I-MOS with Schottky electrodes and an open-base BJT configuration for reduced operating voltage

    Science.gov (United States)

    Kannan, N.; Kumar, M. Jagadesh

    2017-04-01

    In this paper, we have proposed a novel impact ionization MOS (I-MOS) structure, called the Schottky bipolar I-MOS, with Schottky source and drain electrodes and utilizing the open-base bipolar junction transistor (BJT) configuration for achieving reduction in the operating voltage of the I-MOS transistor. We report, using 2-D simulations, a low operating voltage (∼1.1 V) and a low subthreshold swing (∼3.6 mV/Decade). For the corresponding p-i-n I-MOS, the operating voltage is ∼5.5 V. The operating voltage of the Schottky bipolar I-MOS is the lowest reported operating voltage for silicon based I-MOS transistors. The nearly 80% reduction in the operating voltage of the Schottky bipolar I-MOS makes it suitable for applications requiring low operating voltages. The Schottky bipolar I-MOS is also expected to have an improved reliability over the p-i-n I-MOS since high energy carriers, induced by impact ionization near the drain, do not have to pass under the gate region in the channel. The use of Schottky contacts instead of heavily doped source and drain regions and the low channel doping level reduces the required thermal budget for device fabrication. The low operating voltage, low subthreshold swing and possibly improved reliability of the Schottky bipolar I-MOS, makes it a potential solution for applications where steep subthreshold slope transistors are being explored as alternative to the conventional MOS transistor.

  14. Implantation annealing in GaAs by incoherent light

    International Nuclear Information System (INIS)

    Davies, D.E.; Ryan, T.G.; Soda, K.J.; Comer, J.J.

    1983-01-01

    Implanted GaAs has been successfully activated through concentrating the output of quartz halogen lamps to anneal in times of the order of 1 sec. The resulting layers are not restricted by the reduced mobilities and thermal instabilities of laser annealed GaAs. Better activation can be obtained than with furnace annealing but this generally requires maximum temperatures >= 1050degC. (author)

  15. Multibias and thermal behavior of microwave GaN and GaAs based HEMTs

    Science.gov (United States)

    Alim, Mohammad A.; Rezazadeh, Ali A.; Gaquiere, Christophe

    2016-12-01

    Multibias and thermal characterizations on 0.25 μm × (2 × 100) μm AlGaN/GaN/SiC HEMT and 0.5 μm × (2 × 100) μm AlGaAs/InGaAs pseudomorphic HEMT have carried out for the first time. Two competitive device technologies are investigated with the variations of bias and temperature in order to afford a detailed realization of their potentialities. The main finding includes the self heating effect in the GaN device, zero temperature coefficient points at the drain current and transconductance in the GaAs device. The thermal resistance RTH of 7.1, 8.2 and 9.4 °C mm/W for the GaN device was estimated at 25, 75 and 150 °C respectively which are consistent with those found in the open literature. The temperature trend of the threshold voltage VT, Schottky barrier height ϕb, sheet charge densities of two dimensional electron gas ns, and capacitance under the gate Cg are exactly opposite in the two devices; whereas the knee voltage Vk, on resistance Ron, and series resistance Rseries are shows similar trend. The multi-bias and thermal behavior of the output current Ids, output conductance gds, transconductance gm, cut-off frequency ft, maximum frequency fmax, effective velocity of electron, veff and field dependent mobility, μ demonstrates a great potential of GaN device. These results provide some valuable insights for technology of preference for future and current applications.

  16. Interlayer coupling effects on Schottky barrier in the arsenene-graphene van der Waals heterostructures

    Energy Technology Data Exchange (ETDEWEB)

    Xia, Congxin, E-mail: xiacongxin@htu.edu.cn; Xue, Bin; Wang, Tianxing; Peng, Yuting [Department of Physic, Henan Normal University, Xinxiang 453007 (China); Jia, Yu [School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052 (China)

    2015-11-09

    The electronic characteristics of arsenene-graphene van der Waals (vdW) heterostructures are studied by using first-principles methods. The results show that a linear Dirac-like dispersion relation around the Fermi level can be quite well preserved in the vdW heterostructures. Moreover, the p-type Schottky barrier (0.18 eV) to n-type Schottky barrier (0.31 eV) transition occurs when the interlayer distance increases from 2.8 to 4.5 Å, which indicates that the Schottky barrier can be tuned effectively by the interlayer distance in the vdW heterostructures.

  17. Electrical characterization of Au/ZnO thin film Schottky diode on silicon substrate

    Directory of Open Access Journals (Sweden)

    Lintu Rajan

    2016-09-01

    Full Text Available An array of Gold (Au schottky contacts have been deposited on RF Sputtered nanocrystalline Zinc Oxide thin film. A systematic analysis on the electrical parameters of the Schottky diode with the help of current–voltage (I–V and capacitance-voltage (C–V measurements has been done, which confirmed its excellent rectifying characteristics. To incorporate the influence of series resistance in the determination of Schottky diode parameters (barrier height, ideality factor and saturation current, Cheung's method along with thermionic emission model has also used. The discrepancy in the value of barrier height determined from C–V characteristics throws light into the presence of interface states.

  18. A novel nano-structured GaAs solar cell

    Science.gov (United States)

    Liang, Dong; Gu, Anjia; Huo, Yijie; Yan, Jingzhou; Li, Shuang; Garnett, Erik; Pickett, Evan; Kang, Yangsen; Tan, Meiyueh; Cerruto, Antonio Xavier; Zhu, Jia; Hsu, Ching-Mei; Yao, Yan; Riaziat, Majid; Cui, Yi; Harris, James S.

    2011-03-01

    In this presentation, we will demonstrate a novel solar cell with nano-structured dense arrays of single crystal GaAs conformally grown on nanopillar templates with wafer-scale uniformity. The template is prepared via plasma enhanced etching with a monolayer of Si O2 nanospheres as a mask followed by wet chemical etching. The GaAs p-n junction with an AlGaAs passivation window layer is grown via metal-organic chemical vapor deposition (MOCVD). The rectangular shape of the nano single crystal GaAs reveals anisotropic lateral growth rates of GaAs along (011) and (01 1 directions, which can be engineered by tuning the As H3 flow and temperature during growth. Optical absorption measurements show the outstanding light trapping properties of the nano-structured cell, which agree with the simulation results. I-V characteristics show an efficiency of 1.67% for the nano GaAs solar cell, which is 15% higher than its planar control cell with the same thickness of 200nm. The efficiency is the highest among all the large area GaAs nanowire core-shell solar cells reported in literature by 2010.

  19. An ultra-thin Schottky diode as a transmission particle detector for biological microbeams

    International Nuclear Information System (INIS)

    Grad, M; Harken, A; Randers-Pehrson, G; Brenner, D J; Attinger, D

    2012-01-01

    We fabricated ultrathin metal-semiconductor Schottky diodes for use as transmission particle detectors in the biological microbeam at Columbia University's Radiological Research Accelerator Facility (RARAF). The RARAF microbeam can deliver a precise dose of ionizing radiation in cell nuclei with sub-micron precision. To ensure an accurate delivery of charged particles, the facility currently uses a commercial charged-particle detector placed after the sample. We present here a transmission detector that will be placed between the particle accelerator and the biological specimen, allowing the irradiation of samples that would otherwise block radiation from reaching a detector behind the sample. Four detectors were fabricated with co-planar gold and aluminum electrodes thermally evaporated onto etched n-type crystalline silicon substrates, with device thicknesses ranging from 8.5 μm - 13.5 μm. We show coincident detections and pulse-height distributions of charged particles in both the transmission detector and the commercial detector above it. Detections are demonstrated at a range of operating conditions, including incoming particle type, count rate, and beam location on the detectors. The 13.5 μm detector is shown to work best to detect 2.7 MeV protons (H + ), and the 8.5 μm detector is shown to work best to detect 5.4 MeV alpha particles ( 4 He ++ ). The development of a transmission detector enables a range of new experiments to take place at RARAF on radiation-stopping samples such as thick tissues, targets that need immersion microscopy, and integrated microfluidic devices for handling larger quantities of cells and small organisms.

  20. An ultra-thin Schottky diode as a transmission particle detector for biological microbeams

    Science.gov (United States)

    Harken, Andrew; Randers-Pehrson, Gerhard; Attinger, Daniel; Brenner, David J.

    2013-01-01

    We fabricated ultrathin metal-semiconductor Schottky diodes for use as transmission particle detectors in the biological microbeam at Columbia University’s Radiological Research Accelerator Facility (RARAF). The RARAF microbeam can deliver a precise dose of ionizing radiation in cell nuclei with sub-micron precision. To ensure an accurate delivery of charged particles, the facility currently uses a commercial charged-particle detector placed after the sample. We present here a transmission detector that will be placed between the particle accelerator and the biological specimen, allowing the irradiation of samples that would otherwise block radiation from reaching a detector behind the sample. Four detectors were fabricated with co-planar gold and aluminum electrodes thermally evaporated onto etched n-type crystalline silicon substrates, with device thicknesses ranging from 8.5 μm – 13.5 μm. We show coincident detections and pulse-height distributions of charged particles in both the transmission detector and the commercial detector above it. Detections are demonstrated at a range of operating conditions, including incoming particle type, count rate, and beam location on the detectors. The 13.5 μm detector is shown to work best to detect 2.7 MeV protons (H+), and the 8.5 μm detector is shown to work best to detect 5.4 MeV alpha particles (4He++). The development of a transmission detector enables a range of new experiments to take place at RARAF on radiation-stopping samples such as thick tissues, targets that need immersion microscopy, and integrated microfluidic devices for handling larger quantities of cells and small organisms. PMID:24058378

  1. The temperature dependence on the electrical properties of dysprosium oxide deposited on n-porous GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Saghrouni, H., E-mail: hayet_sagrouni@yahoo.fr [Université de Sousse, LabEM-LR11ES34 Energie-Matériaux, Ecole Supérieure des Sciences et de la Technologie, Rue Lamine Abessi 4011, Hammam Sousse (Tunisia); Université de Sousse, Equipe de recherche caractérisations optoélectronique et spectroscopique des matériaux et nanomatériaux pour les télécommunications et capteurs, ISITCOM 4011, Hammam Sousse (Tunisia); Jomni, S. [Université de Tunis El Manar, LR: LAB MA03 Matériaux, Organisation et Propriétés, Faculté des Sciences de Tunis, 2092 (Tunisia); Cherif, A. [Université de Sousse, LabEM-LR11ES34 Energie-Matériaux, Ecole Supérieure des Sciences et de la Technologie, Rue Lamine Abessi 4011, Hammam Sousse (Tunisia); Université de Sousse, Equipe de recherche caractérisations optoélectronique et spectroscopique des matériaux et nanomatériaux pour les télécommunications et capteurs, ISITCOM 4011, Hammam Sousse (Tunisia); Belgacem, W. [Université de Tunis El Manar, LR: LAB MA03 Matériaux, Organisation et Propriétés, Faculté des Sciences de Tunis, 2092 (Tunisia); and others

    2016-08-15

    This paper describes the electrical and dielectric characteristics for the first time of the high-k Dy{sub 2}O{sub 3} oxide film deposited on the porous GaAs substrate by electron beam deposition under ultra vacuum. Morphological characterization is investigated by atomic force microscopy (AFM). The electrical and dielectric properties of Co/Au/Dy{sub 2}O{sub 3}/n-porous GaAs structure were studied in the temperature range of 80–500 K. The conductance and capacitance measurements were performed as a function of bias voltage and frequency. The dielectric constant (ε′), dielectric loss (ε″) and dielectric loss tangent (tanδ) of the structure are obtained from capacitance–voltage (C–V) and conductance–voltage (G/ω–V) measurements. These parameters are found to be strong functions of temperature and bias voltage. In the forward bias region, C–V plots show a negative capacitance (NC) behavior, ε′–V plots for each temperature value take negative values as well. Such negative values of C correspond to the maximum of the conductance (G/ω). The negative capacitance values appear abnormal when compared to the conventional behavior of ideal Schottky barrier diode (SBD) and metal–oxide–semiconductor (MOS) structures. The following behavior of the C and ε′ in the forward bias region has been explained with the minority-carrier injection and relaxation theory. From DC conductance study, electronic conduction is found to be dominated by thermally activated hopping at high temperature. Activation energy is deduced from the variation of conductance with temperature. The Nyquist plots exhibited single semi-circular arcs which were well fitted to an equivalent circuit. - Highlights: • The high-k Dy{sub 2}O{sub 3} oxide film is deposited on n-porous GaAs by means of electron beam deposition. • The electrical and dielectric properties of MOS structure were studied. • A strong negative capacitance (NC) phenomenon has been observed in the C-V and C

  2. Abrupt Schottky Junctions in Al/Ge Nanowire Heterostructures.

    Science.gov (United States)

    Kral, S; Zeiner, C; Stöger-Pollach, M; Bertagnolli, E; den Hertog, M I; Lopez-Haro, M; Robin, E; El Hajraoui, K; Lugstein, A

    2015-07-08

    In this Letter we report on the exploration of axial metal/semiconductor (Al/Ge) nanowire heterostructures with abrupt interfaces. The formation process is enabled by a thermal induced exchange reaction between the vapor-liquid-solid grown Ge nanowire and Al contact pads due to the substantially different diffusion behavior of Ge in Al and vice versa. Temperature-dependent I-V measurements revealed the metallic properties of the crystalline Al nanowire segments with a maximum current carrying capacity of about 0.8 MA/cm(2). Transmission electron microscopy (TEM) characterization has confirmed both the composition and crystalline nature of the pure Al nanowire segments. A very sharp interface between the ⟨111⟩ oriented Ge nanowire and the reacted Al part was observed with a Schottky barrier height of 361 meV. To demonstrate the potential of this approach, a monolithic Al/Ge/Al heterostructure was used to fabricate a novel impact ionization device.

  3. The physics and chemistry of the Schottky barrier height

    International Nuclear Information System (INIS)

    Tung, Raymond T.

    2014-01-01

    The formation of the Schottky barrier height (SBH) is a complex problem because of the dependence of the SBH on the atomic structure of the metal-semiconductor (MS) interface. Existing models of the SBH are too simple to realistically treat the chemistry exhibited at MS interfaces. This article points out, through examination of available experimental and theoretical results, that a comprehensive, quantum-mechanics-based picture of SBH formation can already be constructed, although no simple equations can emerge, which are applicable for all MS interfaces. Important concepts and principles in physics and chemistry that govern the formation of the SBH are described in detail, from which the experimental and theoretical results for individual MS interfaces can be understood. Strategies used and results obtained from recent investigations to systematically modify the SBH are also examined from the perspective of the physical and chemical principles of the MS interface

  4. Electrical characterization of MEH-PPV based Schottky diodes

    Energy Technology Data Exchange (ETDEWEB)

    Nimith, K. M., E-mail: nimithkm@gmail.com; Satyanarayan, M. N., E-mail: satya-mn@nitk.edu.in; Umesh, G., E-mail: umesh52@gmail.com [Optoelectronics Laboratory (OEL), Department of Physics, National Institute of Technology Karnataka (NITK),Surathkal, PO Srinivasnagar, Mangalore, DK-575025 (India)

    2016-05-06

    MEH-PPV Schottky diodes with and without Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT-PSS) have been fabricated and characterized. The highlight of this work is that all the fabrication and characterization steps had been carried out in the ambient conditions and the device fabrication was done without any UV-Ozone surface treatment of ITO anodes. Current Density-Voltage characteristics shows that the addition of hole injection layer (HIL) enhances the charge injection into the polymer layer by reducing the energy barrier across the Indium Tin Oxide (ITO)-Organic interface. The rectification ratio increases to 2.21 from 0.76 at 5V for multilayer devices compared to single layer devices. Further we investigated the effect of an alkali metal fluoride (LiF) by inserting a thin layer in between the organic layer and Aluminum (Al) cathode. The results of these investigations will be discussed in detail.

  5. Graphene-Based Reversible Nano-Switch/Sensor Schottky Diode

    Science.gov (United States)

    Miranda, Felix A.; Meador, Michael A.; Theofylaktos, Onoufrios; Pinto, Nicholas J.; Mueller, Carl H.; Santos-Perez, Javier

    2010-01-01

    This proof-of-concept device consists of a thin film of graphene deposited on an electrodized doped silicon wafer. The graphene film acts as a conductive path between a gold electrode deposited on top of a silicon dioxide layer and the reversible side of the silicon wafer, so as to form a Schottky diode. By virtue of the two-dimensional nature of graphene, this device has extreme sensitivity to different gaseous species, thereby serving as a building block for a volatile species sensor, with the attribute of having reversibility properties. That is, the sensor cycles between active and passive sensing states in response to the presence or absence of the gaseous species.

  6. Damage effect and mechanism of the GaAs pseudomorphic high electron mobility transistor induced by the electromagnetic pulse

    Science.gov (United States)

    Xiao-Wen, Xi; Chang-Chun, Chai; Gang, Zhao; Yin-Tang, Yang; Xin-Hai, Yu; Yang, Liu

    2016-04-01

    The damage effect and mechanism of the electromagnetic pulse (EMP) on the GaAs pseudomorphic high electron mobility transistor (PHEMT) are investigated in this paper. By using the device simulation software, the distributions and variations of the electric field, the current density and the temperature are analyzed. The simulation results show that there are three physical effects, i.e., the forward-biased effect of the gate Schottky junction, the avalanche breakdown, and the thermal breakdown of the barrier layer, which influence the device current in the damage process. It is found that the damage position of the device changes with the amplitude of the step voltage pulse. The damage appears under the gate near the drain when the amplitude of the pulse is low, and it also occurs under the gate near the source when the amplitude is sufficiently high, which is consistent with the experimental results. Project supported by the National Basic Research Program of China (Grant No. 2014CB339900), and the Open Fund of Key Laboratory of Complex Electromagnetic Environment Science and Technology, China Academy of Engineering Physics (CAEP) (Grant No. 2015-0214.XY.K).

  7. Bulk GaN Schottky Diodes for Millimeter Wave Frequency Multipliers, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — Within the context of this project, White Light Power Inc. (WLPI) will demonstrate prototype vertical GaN Schottky diodes for high-power rectification at W-band. To...

  8. Current Transport Properties of Monolayer Graphene/n-Si Schottky Diodes

    Science.gov (United States)

    Pathak, C. S.; Garg, Manjari; Singh, J. P.; Singh, R.

    2018-05-01

    The present work reports on the fabrication and the detailed macroscopic and nanoscale electrical characteristics of monolayer graphene/n-Si Schottky diodes. The temperature dependent electrical transport properties of monolayer graphene/n-Si Schottky diodes were investigated. Nanoscale electrical characterizations were carried out using Kelvin probe force microscopy and conducting atomic force microscopy. Most the values of ideality factor and barrier height are found to be in the range of 2.0–4.4 and 0.50–0.70 eV for monolayer graphene/n-Si nanoscale Schottky contacts. The tunneling of electrons is found to be responsible for the high value of ideality factor for nanoscale Schottky contacts.

  9. Bulk GaN Schottky Diodes for Millimeter Wave Frequency Multipliers, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — Within the context of this project, White Light Power Inc. (WLPI) will demonstrate the feasibility of using vertical GaN Schottky diodes for high-power rectification...

  10. Tuning the Schottky barrier in the arsenene/graphene van der Waals heterostructures by electric field

    Science.gov (United States)

    Li, Wei; Wang, Tian-Xing; Dai, Xian-Qi; Wang, Xiao-Long; Ma, Ya-Qiang; Chang, Shan-Shan; Tang, Ya-Nan

    2017-04-01

    Using density functional theory calculations, we investigate the electronic properties of arsenene/graphene van der Waals (vdW) heterostructures by applying external electric field perpendicular to the layers. It is demonstrated that weak vdW interactions dominate between arsenene and graphene with their intrinsic electronic properties preserved. We find that an n-type Schottky contact is formed at the arsenene/graphene interface with a Schottky barrier of 0.54 eV. Moreover, the vertical electric field can not only control the Schottky barrier height but also the Schottky contacts (n-type and p-type) and Ohmic contacts (n-type) at the interface. Tunable p-type doping in graphene is achieved under the negative electric field because electrons can transfer from the Dirac point of graphene to the conduction band of arsenene. The present study would open a new avenue for application of ultrathin arsenene/graphene heterostructures in future nano- and optoelectronics.

  11. Bulk GaAs as a solar neutrino detector

    Energy Technology Data Exchange (ETDEWEB)

    Gavrin, V.N.; Kozlova, Y.P. E-mail: gavrin@adonis.iasnet.ru; Veretenkin, E.P.; Bowles, T.J.; Eremin, V.K.; Verbitskaya, E.M.; Markov, A.V.; Polyakov, A.Y.; Koshelev, O.G.; Morozova, V.F

    2001-06-21

    A GaAs detector may offer the unique possibility to independently study neutrino properties and solar physics. The ability to measure the flux of p-p, {sup 7}Be and pep solar neutrinos would allow one to approach a solution of the 'solar neutrino problem', i.e. the explanation of the significant deficit in observed capture rate of solar neutrinos. A large GaAs solar neutrino detector would allow to measure parameters for possible Mikheyev-Smirnov-Wolfenstein neutrino oscillations with unprecedented precision. A model-independent test for sterile neutrinos is also possible. A direct measurement of the temperature profile of the Sun center appears feasible. A GaAs detector would also provide the ability to observe neutral current interactions in addition to addressing a wide range of other interesting physics. In order to measure the p-p, pep and {sup 7}Be neutrinos a detector is required with low threshold (< 350 keV), good energy resolution (< 2 keV) and low background. A GaAs solid-state detector could meet the listed requirements. A large GaAs detector would be composed of approximately 40,000 intrinsic GaAs crystals, each weighting 3.2 kg. Such a detector would have a mass of 125 ton and would contain 60 ton of Ga occupying a volume of roughly 3 m on one side. Previous efforts by many groups have resulted in producing very small detectors with reasonably good resolution. However, it has thus far proved impossible to make large detectors with good resolution. Thus, a solar neutrino detector such as the one described above is obviously very ambitious, but the scientific motivation is sufficiently high that we have begun a research and development program with the goal of determining the technical feasibility of constructing large GaAs crystals with the requisite electronic properties to serve as particle detectors.

  12. Physical Mechanisms Responsible for Electrical Conduction in Pt/GaN Schottky Diodes

    OpenAIRE

    H. MAZARI; K. AMEUR; N. BENSEDDIK; Z. BENAMARA; R. KHELIFI; M. MOSTEFAOUI; N. ZOUGAGH; N. BENYAHYA; R. BECHAREF; G. BASSOU; B. GRUZZA; J. M. BLUET; C. BRU-CHEVALLIER

    2014-01-01

    The current-voltage (I-V) characteristics of Pt/(n.u.d)-GaN and Pt/Si-doped-GaN diodes Schottky are investigated. Based on these measurements, physical mechanisms responsible for electrical conduction have been suggested. The contribution of thermionic-emission current and various other current transport mechanisms were assumed when evaluating the Schottky barrier height. Thus the generation-recombination, tunneling and leakage currents caused by inhomogeneities and defects at metal-semicondu...

  13. Electronic Characteristics of Rare Earth Doped GaN Schottky Diodes

    Science.gov (United States)

    2013-03-21

    types of diode. This revised value of A** is in exact agreement with the experimentally determined results of Hacke et al. [20] who also used gold...http://www1.eere.energy.gov/buildings/ssl/ . Accessed 6 Jan 2013. [15] Tung, Raymond T. Brooklyn College Schottky Barrier Height Tutorial ... Hacke , P., Detchprohm, T., Kiramatsu, K., Sawaki, N. (1993). Schottky barrier on n-type GaN grown by hydride vapor phase epitaxy. Applied Physics

  14. Non-classical logic inverter coupling a ZnO nanowire-based Schottky barrier transistor and adjacent Schottky diode.

    Science.gov (United States)

    Hosseini Shokouh, Seyed Hossein; Raza, Syed Raza Ali; Lee, Hee Sung; Im, Seongil

    2014-08-21

    On a single ZnO nanowire (NW), we fabricated an inverter-type device comprising a Schottky diode (SD) and field-effect transistor (FET), aiming at 1-dimensional (1D) electronic circuits with low power consumption. The SD and adjacent FET worked respectively as the load and driver, so that voltage signals could be easily extracted as the output. In addition, NW FET with a transparent conducting oxide as top gate turned out to be very photosensitive, although ZnO NW SD was blind to visible light. Based on this, we could achieve an array of photo-inverter cells on one NW. Our non-classical inverter is regarded as quite practical for both logic and photo-sensing due to its performance as well as simple device configuration.

  15. A polarized photoluminescence study of strained layer GaAs photocathodes

    International Nuclear Information System (INIS)

    Mair, R.A.

    1996-07-01

    Photoluminescence measurements have been made on a set of epitaxially grown strained GaAs photocathode structures. The photocathodes are designed to exhibit a strain-induced enhancement of the electron spin polarization obtainable by optical pumping with circularly polarized radiation of near band gap energy. For the case of non-strained GaAs, the degree of spin polarization is limited to 50% by crystal symmetry. Under an appropriate uniaxial compression or tension, however, the valence band structure near the gap minimum is modified such that a spin polarization of 100% is theoretically possible. A total of nine samples with biaxial compressive strains ranging from zero to ∼0.8% are studied. X-ray diffraction analysis, utilizing Bragg reflections, is used to determine the crystal lattice structure of the samples. Luminescence spectra and luminescence circular polarization data are obtained at room temperature, ∼78 K and ∼12 K. The degree of luminescence circular polarization is used as a relative measure of the photo-excited electron spin polarization. The room temperature luminescence circular polarization data is compared with the measured electron spin polarization when the samples are used as electron photo-emitters with a negative electron affinity surface preparation. The luminescence data is also analyzed in conjunction with the crystal structure data with the goal of understanding the strain dependent valence band structure, optical pumping characteristics and spin depolarization mechanisms of the photocathode structures. A simple model is used to describe the luminescence data, obtained for the set of samples. Within the assumptions of the model, the deformation potentials a, b and d for GaAs are determined. The measured values are a = -10.16±.21 eV, b = -2.00±.05 eV and d = -4.87±.29 eV. Good agreement with published values of the deformation potentials provides support for the model used to describe the data

  16. Tuning the Schottky contacts in the phosphorene and graphene heterostructure by applying strain.

    Science.gov (United States)

    Liu, Biao; Wu, Li-Juan; Zhao, Yu-Qing; Wang, Lin-Zhi; Caii, Meng-Qiu

    2016-07-20

    The structures and electronic properties of the phosphorene and graphene heterostructure are investigated by density functional calculations using the hybrid Heyd-Scuseria-Ernzerhof (HSE) functional. The results show that the intrinsic properties of phosphorene and graphene are preserved due to the weak van der Waals contact. But the electronic properties of the Schottky contacts in the phosphorene and graphene heterostructure can be tuned from p-type to n-type by the in-plane compressive strains from -2% to -4%. After analyzing the total band structure and density of states of P atom orbitals, we find that the Schottky barrier height (SBH) is determined by the P-pz orbitals. What is more, the variation of the work function of the phosphorene monolayer and the graphene electrode and the Fermi level shift are the nature of the transition of Schottky barrier from n-type Schottky contact to p-type Schottky contact in the phosphorene and graphene heterostructure under different in-plane strains. We speculate that these are general results of tuning of the electronic properties of the Schottky contacts in the phosphorene and graphene heterostructure by controlling the in-plane compressive strains to obtain a promising method to design and fabricate a phosphorene-graphene based field effect transistor.

  17. Tuning the Schottky rectification in graphene-hexagonal boron nitride-molybdenum disulfide heterostructure.

    Science.gov (United States)

    Liu, Biao; Zhao, Yu-Qing; Yu, Zhuo-Liang; Wang, Lin-Zhi; Cai, Meng-Qiu

    2017-12-04

    It was still a great challenge to design high performance of rectification characteristic for the rectifier diode. Lately, a new approach was proposed experimentally to tune the Schottky barrier height (SBH) by inserting an ultrathin insulated tunneling layer to form metal-insulator-semiconductor (MIS) heterostructures. However, the electronic properties touching off the high performance of these heterostructures and the possibility of designing more efficient applications for the rectifier diode were not presently clear. In this paper, the structural, electronic and interfacial properties of the novel MIS diode with the graphene/hexagonal boron nitride/monolayer molybdenum disulfide (GBM) heterostructure had been investigated by first-principle calculations. The calculated results showed that the intrinsic properties of graphene and MoS 2 were preserved due to the weak van der Waals contact. The height of interfacial Schottky barrier can be tuned by the different thickness of hBN layers. In addition, the GBM Schottky diode showed more excellent rectification characteristic than that of GM Schottky diode due to the interfacial band bending caused by the epitaxial electric field. Based on the electronic band structure, we analyzed the relationship between the electronic structure and the nature of the Schottky rectifier, and revealed the potential of utilizing GBM Schottky diode for the higher rectification characteristic devices. Copyright © 2017 Elsevier Inc. All rights reserved.

  18. Radiation

    International Nuclear Information System (INIS)

    Davidson, J.H.

    1986-01-01

    The basic facts about radiation are explained, along with some simple and natural ways of combating its ill-effects, based on ancient healing wisdom as well as the latest biochemical and technological research. Details are also given of the diet that saved thousands of lives in Nagasaki after the Atomic bomb attack. Special comment is made on the use of radiation for food processing. (U.K.)

  19. 46 CFR Sec. 7 - Operation under current GAA/MSTS Southeast Asia Program.

    Science.gov (United States)

    2010-10-01

    ... 46 Shipping 8 2010-10-01 2010-10-01 false Operation under current GAA/MSTS Southeast Asia Program... AUTHORITY VOYAGE DATA Sec. 7 Operation under current GAA/MSTS Southeast Asia Program. In order to adapt the provisions of NSA Order 35 (OPR-2) to the particular circumstances of the present GAA/MSTS Southeast Asia...

  20. Effects of guanidinoacetic acid(gaa supplementation in rats with chronic renal failure(crf

    Directory of Open Access Journals (Sweden)

    Yoshiharu Tsubakihara

    2012-06-01

    *; p<0.05 vs Sham $; p<0.05 vs GAA 0In conclusion, we demonstrated a deficiency of GAA and CRT, and muscle weekness in CRF rats. However, oral GAA supplementation could recover muscle content of CRT and muscle capabilities in these rats.

  1. Atomic hydrogen cleaning of GaAs photocathodes

    International Nuclear Information System (INIS)

    Poelker, M.; Price, J.; Sinclair, C.

    1997-01-01

    It is well known that surface contaminants on semiconductors can be removed when samples are exposed to atomic hydrogen. Atomic H reacts with oxides and carbides on the surface, forming compounds that are liberated and subsequently pumped away. Experiments at Jefferson lab with bulk GaAs in a low-voltage ultra-high vacuum H cleaning chamber have resulted in the production of photocathodes with high photoelectron yield (i.e., quantum efficiency) and long lifetime. A small, portable H cleaning apparatus also has been constructed to successfully clean GaAs samples that are later removed from the vacuum apparatus, transported through air and installed in a high-voltage laser-driven spin-polarized electron source. These results indicate that this method is a versatile and robust alternative to conventional wet chemical etching procedures usually employed to clean bulk GaAs

  2. Intrinsic spin lifetimes in GaAs (110) quantum wells

    Energy Technology Data Exchange (ETDEWEB)

    Mueller, Georg; Roemer, Michael; Huebner, Jens; Oestreich, Michael [Institut fuer Festkoerperphysik, Gottfried Wilhelm Leibniz Universitaet Hannover, Hannover (Germany); Schuh, Dieter; Wegscheider, Werner [Institut fuer Experimentelle und Angewandte Physik, Universitaet Regensburg (Germany)

    2009-07-01

    GaAs(110) quantum wells attract great attention due to the long spin lifetime for electron spins along the growth axis and are, therefore, of interest for future spin based optoelectronic devices. At low temperatures, optical injection of a finite spin polarization yields strongly enhanced spin dephasing due to the Bir Aronov Pikus mechanism that arises from the exchange interaction between electrons and holes. Thus, the intrinsic spin lifetime in GaAs(110) quantum wells has been unknown. In this work, the non-demolition technique of spin noise spectroscopy, which only relies on statistical spin fluctuations, is applied to GaAs(110) quantum wells in order to measure the intrinsic spin lifetimes. Furthermore, the Brownian motion of the electrons modifies the linewidth of the measured spin noise spectra due to time of flight broadening. This effect uniquely allows to study electronic motion at thermal equilibrium.

  3. GaAs strip detectors: the Australian production program

    International Nuclear Information System (INIS)

    Butcher, K.S.A.; Alexiev, D.

    1995-01-01

    The Australian High Energy Physics consortium (composed of the University of Melbourne, the University of Sydney and ANSTO) has been investigating the possibility of producing a large area wheel of SI GaAs detectors for the ATLAS detector array. To help assess the extent of Australia's role in this venture a few SI GaAs microstrip detectors are to be manufactured under contract by the CSIRO division of Radiophysics GaAs IC Prototyping Facility. The planned production of the devices is discussed. First, the reasons for producing the detectors here in Australia are examined, then some basic characteristics of the material are considered, and finally details are provided of the design used for the manufacture of the devices. Two sets of detectors will be produced using the standard Glasgow production recipe; SIGaAs and GaN. The Glasgow mask set is being used as a benchmark against which to compare the Australian devices

  4. Laser-excited photoluminescence of three-layer GaAs double-heterostructure laser material

    International Nuclear Information System (INIS)

    Nash, F.R.; Dixon, R.W.; Barnes, P.A.; Schumaker, N.E.

    1975-01-01

    The successful fabrication of high-quality DH GaAs lasers from a simplified three-layer structure is reported. A major asset of this structure is the transparency of its final layer to recombination radiation occurring in the active layer, thus permitting the use of nondestructive photoluminescent techniques for material evaluation prior to device fabrication. In the course of photoluminescence investigations on this material the additional important observation has been made that indirect excitation (in which photocarriers are generated in the top ternary layer) has significant advantages over direct excitation (in which photocarriers are generated directly in the active layer). These include (i) the direct measurement of Al concentrations in both upper layers, (ii) the measurements of the minority-carrier diffusion length in the upper layer, (iii) an easily obtained indication of taper in the thickness of the upper layer, and (iv) surprisingly effective excitation of the active layer. By combining direct and indirect excitation it is shown that a clearer understanding of the location and detrimental influences of defects in the GaAs laser structure may be obtained. For example, the width of the region of reduced luminescence associated with many defects is found to be very excitation dependent and is confirmed to arise fr []m reduced active region luminescence. The photoluminescent excitation techniques described should be useful in the study of other heterostructure devices and material systems

  5. MOCVD growth and ultrafast photoluminescence in GaAs and InAs freestanding quantum whiskers: A review

    Science.gov (United States)

    Viswanath, A. Kasi; Hiruma, K.; Yazawa, M.; Ogawa, K.; Katsuyama, T.

    1994-02-01

    Nanometer-size quantum whiskers of InAs and GaAs were fabricated by low-pressure MOCVD. Time-integrated and time-resolved photoluminescence of GaAs wires of diameters 200, 100, 70, and 50 nm were studied. The temperature dependence of PL peak energy was found to follow the same variation as the bandgap of GaAs, and Varshni's theory was used to explain the temperature dependence. The main channel of radiative recombination was found to be due to free excitons. The nonuniformity in diameter and lattice phonon interactions were considered to understand the origin of the linewidth. From the time-resolved PL, the surface recombination lifetimes were measured directly. Surface recombination velocities were evaluated and were correlated to wire diameter. The quantum-size-dependent spatial part of the electronic wave function was thought to be responsible for the variation of surface recombination velocity with diameter. Surface treatment with sulphur reduced the surface depletion layer, as evidenced from the time-resolved and time-integrated spectra. The carrier lifetime was in picosecond time scales at 7 K and increased with temperature, thus confirming the quantum confinement effects. The polarization experiments revealed the one-dimensional nature of quantum whiskers.

  6. Peeled film GaAs solar cells for space power

    Science.gov (United States)

    Wilt, D. M.; Deangelo, F. L.; Thomas, R. D.; Bailey, S. G.; Landis, G. A.; Brinker, D. J.; Fatemi, N. S.

    1990-01-01

    Gallium arsenide (GaAs) peeled film solar cells were fabricated, by Organo-Metallic Vapor Phase Epitaxy (OMVPE), incorporating an aluminum arsenide (AlAs) parting layer between the device structure and the GaAs substrate. This layer was selectively removed by etching in dilute hydrofloric (HF) acid to release the epitaxial film. Test devices exhibit high series resistance due to insufficient back contact area. A new design is presented which uses a coverglass superstrate for structural support and incorporates a coplanar back contact design. Devices based on this design should have a specific power approaching 700 W/Kg.

  7. Scanning microwave microscopy applied to semiconducting GaAs structures

    Science.gov (United States)

    Buchter, Arne; Hoffmann, Johannes; Delvallée, Alexandra; Brinciotti, Enrico; Hapiuk, Dimitri; Licitra, Christophe; Louarn, Kevin; Arnoult, Alexandre; Almuneau, Guilhem; Piquemal, François; Zeier, Markus; Kienberger, Ferry

    2018-02-01

    A calibration algorithm based on one-port vector network analyzer (VNA) calibration for scanning microwave microscopes (SMMs) is presented and used to extract quantitative carrier densities from a semiconducting n-doped GaAs multilayer sample. This robust and versatile algorithm is instrument and frequency independent, as we demonstrate by analyzing experimental data from two different, cantilever- and tuning fork-based, microscope setups operating in a wide frequency range up to 27.5 GHz. To benchmark the SMM results, comparison with secondary ion mass spectrometry is undertaken. Furthermore, we show SMM data on a GaAs p-n junction distinguishing p- and n-doped layers.

  8. Peeled film GaAs solar cells for space power

    Science.gov (United States)

    Wilt, D. M.; Deangelo, F. L.; Thomas, R. D.; Bailey, S. G.; Landis, G. A.; Brinker, D. J.; Fatemi, N. S.

    1990-05-01

    Gallium arsenide (GaAs) peeled film solar cells were fabricated, by Organo-Metallic Vapor Phase Epitaxy (OMVPE), incorporating an aluminum arsenide (AlAs) parting layer between the device structure and the GaAs substrate. This layer was selectively removed by etching in dilute hydrofloric (HF) acid to release the epitaxial film. Test devices exhibit high series resistance due to insufficient back contact area. A new design is presented which uses a coverglass superstrate for structural support and incorporates a coplanar back contact design. Devices based on this design should have a specific power approaching 700 W/Kg.

  9. Performance of a GaAs electron source

    International Nuclear Information System (INIS)

    Calabrese, R.; Ciullo, G.; Della Mea, G.; Egeni, G.P.; Guidi, V.; Lamanna, G.; Lenisa, P.; Maciga, B.; Rigato, V.; Rudello, V.; Tecchio, L.; Yang, B.; Zandolin, S.

    1994-01-01

    We discuss the performance improvement of a GaAs electron source. High quantum yield (14%) and constant current extraction (1 mA for more than four weeks) are achieved after a little initial decay. These parameters meet the requirements for application of the GaAs photocathode as a source for electron cooling devices. We also present the preliminary results of a surface analysis experiment, carried out by means of the RBS technique to check the hypothesis of cesium evaporation from the surface when the photocathode is in operation. (orig.)

  10. Carrier velocity effect on carbon nanotube Schottky contact

    Energy Technology Data Exchange (ETDEWEB)

    Fathi, Amir, E-mail: fathi.amir@hotmail.com [Urmia University, Department of Electrical Engineering, Microelectronic Research Laboratory (Iran, Islamic Republic of); Ahmadi, M. T., E-mail: mt.ahmadi@urmia.ac.ir; Ismail, Razali, E-mail: Razali@fke.utm.my [University Technology Malaysia, Department of Electronic Engineering (Malaysia)

    2016-08-15

    One of the most important drawbacks which caused the silicon based technologies to their technical limitations is the instability of their products at nano-level. On the other side, carbon based materials such as carbon nanotube (CNT) as alternative materials have been involved in scientific efforts. Some of the important advantages of CNTs over silicon components are high mechanical strength, high sensing capability and large surface-to-volume ratio. In this article, the model of CNT Schottky transistor current which is under exterior applied voltage is employed. This model shows that its current has a weak dependence on thermal velocity corresponding to the small applied voltage. The conditions are quite different for high bias voltages which are independent of temperature. Our results indicate that the current is increased by Fermi velocity, but the I–V curves will not have considerable changes with the variations in number of carriers. It means that the current doesn’t increase sharply by voltage variations over different number of carriers.

  11. Alternative current source based Schottky contact with additional electric field

    Science.gov (United States)

    Mamedov, R. K.; Aslanova, A. R.

    2017-07-01

    Additional electric field (AEF) in the Schottky contacts (SC) that covered the peripheral contact region wide and the complete contact region narrow (as TMBS diode) SC. Under the influence of AEF is a redistribution of free electrons produced at certain temperatures of the semiconductor, and is formed the space charge region (SCR). As a result of the superposition of the electric fields SCR and AEF occurs the resulting electric field (REF). The REF is distributed along a straight line perpendicular to the contact surface, so that its intensity (and potential) has a minimum value on the metal surface and the maximum value at a great distance from the metal surface deep into the SCR. Under the influence of AEF as a sided force the metal becomes negative pole and semiconductor - positive pole, therefore, SC with AEF becomes an alternative current source (ACS). The Ni-nSi SC with different diameters (20-1000 μm) under the influence of the AEF as sided force have become ACS with electromotive force in the order of 0.1-1.0 mV, which are generated the electric current in the range of 10-9-10-7 A, flowing through the external resistance 1000 Ohm.

  12. Gallium arsenide (GaAs) island growth under SiO(2) nanodisks patterned on GaAs substrates.

    Science.gov (United States)

    Tjahjana, Liliana; Wang, Benzhong; Tanoto, Hendrix; Chua, Soo-Jin; Yoon, Soon Fatt

    2010-05-14

    We report a growth phenomenon where uniform gallium arsenide (GaAs) islands were found to grow underneath an ordered array of SiO(2) nanodisks on a GaAs(100) substrate. Each island eventually grows into a pyramidal shape resulting in the toppling of the supported SiO(2) nanodisk. This phenomenon occurred consistently for each nanodisk across a large patterned area of approximately 50 x 50 microm(2) (with nanodisks of 210 nm diameter and 280 nm spacing). The growth mechanism is attributed to a combination of 'catalytic' growth and facet formation.

  13. Schottky junction photovoltaic devices based on CdS single nanobelts.

    Science.gov (United States)

    Ye, Y; Dai, L; Wu, P C; Liu, C; Sun, T; Ma, R M; Qin, G G

    2009-09-16

    Schottky junction photovoltaic (PV) devices were fabricated on single CdS nanobelts (NBs). Au was used as the Schottky contact, and In/Au was used as the ohmic contact to CdS NB. Typically, the Schottky junction exhibits a well-defined rectifying behavior in the dark with a rectification ratio greater than 10(3) at +/- 0.3 V; and the PV device exhibits a clear PV behavior with an open circuit photovoltage of about 0.16 V, a short circuit current of about 23.8 pA, a maximum output power of about 1.6 pW, and a fill factor of 42%. Moreover, the output power can be multiplied by connecting two or more of the Schottky junction PV devices, made on a single CdS NB, in parallel or in series. This study demonstrates that the 1D Schottky junction PV devices, which have the merits of low cost, easy fabrication and material universality, can be an important candidate for power sources in nano-optoelectronic systems.

  14. Microwave Annealing for NiSiGe Schottky Junction on SiGe P-Channel

    Directory of Open Access Journals (Sweden)

    Yu-Hsien Lin

    2015-11-01

    Full Text Available In this paper, we demonstrated the shallow NiSiGe Schottky junction on the SiGe P-channel by using low-temperature microwave annealing. The NiSiGe/n-Si Schottky junction was formed for the Si-capped/SiGe multi-layer structure on an n-Si substrate (Si/Si0.57Ge0.43/Si through microwave annealing (MWA ranging from 200 to 470 °C for 150 s in N2 ambient. MWA has the advantage of being diffusion-less during activation, having a low-temperature process, have a lower junction leakage current, and having low sheet resistance (Rs and contact resistivity. In our study, a 20 nm NiSiGe Schottky junction was formed by TEM and XRD analysis at MWA 390 °C. The NiSiGe/n-Si Schottky junction exhibits the highest forward/reverse current (ION/IOFF ratio of ~3 × 105. The low temperature MWA is a very promising thermal process technology for NiSiGe Schottky junction manufacturing.

  15. Transverse Schottky spectra and beam transfer functions of coasting ion beams with space charge

    Energy Technology Data Exchange (ETDEWEB)

    Paret, Stefan

    2010-02-22

    A study of the transverse dynamics of coasting ion beams with moderate space charge is presented in this work. From the dispersion relation with linear space charge, an analytic model describing the impact of space charge on transverse beam transfer functions (BTFs) and the stability limits of a beam is derived. The dielectric function obtained in this way is employed to describe the transverse Schottky spectra with linear space charge as well. The difference between the action of space charge and impedances is highlighted. The setup and the results of an experiment performed in the heavy ion synchrotron SIS-18 at GSI to detect space-charge effects at different beam intensities are explicated. The measured transverse Schottky spectra and BTFs are compared with the linear space-charge model. The stability diagrams constructed from the BTFs are presented. The space-charge parameters evaluated from the Schottky and BTF measurements are compared with estimations based on measured beam parameters. The impact of collective effects on the Schottky and BTF diagnostics is also investigated through numerical simulations. For this purpose the self-field of beams with linear and non-linear transverse density-distributions is computed on a twodimensional grid. The noise of the random particle distribution causes fluctuations of the dipole moment of the beam which produce the Schottky spectrum. BTFs are simulated by exciting the beam with transverse kicks. The simulation results are used to verify the space-charge model. (orig.)

  16. Transverse Schottky spectra and beam transfer functions of coasting ion beams with space charge

    International Nuclear Information System (INIS)

    Paret, Stefan

    2010-01-01

    A study of the transverse dynamics of coasting ion beams with moderate space charge is presented in this work. From the dispersion relation with linear space charge, an analytic model describing the impact of space charge on transverse beam transfer functions (BTFs) and the stability limits of a beam is derived. The dielectric function obtained in this way is employed to describe the transverse Schottky spectra with linear space charge as well. The difference between the action of space charge and impedances is highlighted. The setup and the results of an experiment performed in the heavy ion synchrotron SIS-18 at GSI to detect space-charge effects at different beam intensities are explicated. The measured transverse Schottky spectra and BTFs are compared with the linear space-charge model. The stability diagrams constructed from the BTFs are presented. The space-charge parameters evaluated from the Schottky and BTF measurements are compared with estimations based on measured beam parameters. The impact of collective effects on the Schottky and BTF diagnostics is also investigated through numerical simulations. For this purpose the self-field of beams with linear and non-linear transverse density-distributions is computed on a twodimensional grid. The noise of the random particle distribution causes fluctuations of the dipole moment of the beam which produce the Schottky spectrum. BTFs are simulated by exciting the beam with transverse kicks. The simulation results are used to verify the space-charge model. (orig.)

  17. Improved photovoltaic performance of crystalline-Si/organic Schottky junction solar cells using ferroelectric polymers

    Science.gov (United States)

    Liu, Q.; Khatri, I.; Ishikawa, R.; Fujimori, A.; Ueno, K.; Manabe, K.; Nishino, H.; Shirai, H.

    2013-10-01

    The effect of inserting an ultrathin layer of ferroelectric (FE) poly(vinylidene fluoride-tetrafluoroethylene) P(VDF-TeFE) at the crystalline (c-)Si/poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) interface of a c-Si/PEDOT:PSS Schottky junction solar cell is demonstrated. P(VDF-TeFE) is a highly resistive material that exhibits a large, permanent, internal polarization electric field by poling of molecular dipole among the polymer chains. Because of these properties, performance can be enhanced by adjusting the thickness of the FE layer and subsequent poling process. Inserting a 3-nm-thick FE layer increases the power conversion efficiency η from 10.2% to 11.4% with a short-circuit current density Jsc of 28.85 mA/cm2, an open-circuit voltage Voc of 0.57 V, and a fill factor FF of 0.692. Subsequent poling of the FE layer under a reverse DC bias stress increased η up to 12.3% with a Jsc of 29.7 mA/cm2, a Voc of 0.58 V, and an FF of 0.71. The obtained results confirm that the spontaneous polarization of the FE layers is responsible for the enhancement of η, and that the polarization-based enhancement works if the FE layer is highly crystalline. These findings originate from efficient charge extraction to the electrodes and a suppression of non-radiative recombination at the c-Si/PEDOT:PSS interface.

  18. Reliability of GaAs processes for space applications

    OpenAIRE

    Peray, J.F; Fiers, C.; Crudo, P.; Jacobelli, C.

    1992-01-01

    This paper reviews the reliability of GaAs MMICs processes for low noise and power applications in future space systems. Each technology and library element were evaluated in terms of reliability. Results present main data of each process and an understanding of the causes of each failure modes. Improvements methodology is explained and first results are showed.

  19. Gallium arsenide (GaAs) quantum photonic waveguide circuits

    Science.gov (United States)

    Wang, Jianwei; Santamato, Alberto; Jiang, Pisu; Bonneau, Damien; Engin, Erman; Silverstone, Joshua W.; Lermer, Matthias; Beetz, Johannes; Kamp, Martin; Höfling, Sven; Tanner, Michael G.; Natarajan, Chandra M.; Hadfield, Robert H.; Dorenbos, Sander N.; Zwiller, Val; O'Brien, Jeremy L.; Thompson, Mark G.

    2014-09-01

    Integrated quantum photonics is a promising approach for future practical and large-scale quantum information processing technologies, with the prospect of on-chip generation, manipulation and measurement of complex quantum states of light. The gallium arsenide (GaAs) material system is a promising technology platform, and has already successfully demonstrated key components including waveguide integrated single-photon sources and integrated single-photon detectors. However, quantum circuits capable of manipulating quantum states of light have so far not been investigated in this material system. Here, we report GaAs photonic circuits for the manipulation of single-photon and two-photon states. Two-photon quantum interference with a visibility of 94.9±1.3% was observed in GaAs directional couplers. Classical and quantum interference fringes with visibilities of 98.6±1.3% and 84.4±1.5% respectively were demonstrated in Mach-Zehnder interferometers exploiting the electro-optic Pockels effect. This work paves the way for a fully integrated quantum technology platform based on the GaAs material system.

  20. Picosecond relaxation of X-ray excited GaAs

    Czech Academy of Sciences Publication Activity Database

    Tkachenko, V.; Medvedev, Nikita; Lipp, V.; Ziaja, B.

    2017-01-01

    Roč. 24, Sep (2017), s. 15-21 ISSN 1574-1818 Institutional support: RVO:68378271 Keywords : GaAS * X-ray excitation * picosecond relaxation Subject RIV: BL - Plasma and Gas Discharge Physics OBOR OECD: Fluids and plasma physics (including surface physics) Impact factor: 0.908, year: 2016

  1. GaAs Photovoltaics on Polycrystalline Ge Substrates

    Science.gov (United States)

    Wilt, David M.; Pal, AnnaMaria T.; McNatt, Jeremiah S.; Wolford, David S.; Landis, Geoffrey A.; Smith, Mark A.; Scheiman, David; Jenkins, Phillip P.; McElroy Bruce

    2007-01-01

    High efficiency III-V multijunction solar cells deposited on metal foil or even polymer substrates can provide tremendous advantages in mass and stowage, particularly for planetary missions. As a first step towards that goal, poly-crystalline p/i/n GaAs solar cells are under development on polycrystalline Ge substrates. Organo Metallic Vapor Phase Epitaxy (OMVPE) parameters for pre-growth bake, nucleation and deposition have been examined. Single junction p/i/n GaAs photovoltaic devices, incorporating InGaP front and back window layers, have been grown and processed. Device performance has shown a dependence upon the thickness of a GaAs buffer layer deposited between the Ge substrate and the active device structure. A thick (2 m) GaAs buffer provides for both increased average device performance as well as reduced sensitivity to variations in grain size and orientation. Illumination under IR light (lambda > 1 micron), the cells showed a Voc, demonstrating the presence of an unintended photoactive junction at the GaAs/Ge interface. The presence of this junction limited the efficiency to approx.13% (estimated with an anti-refection coating) due to the current mismatch and lack of tunnel junction interconnect.

  2. Density-dependent electron scattering in photoexcited GaAs

    DEFF Research Database (Denmark)

    Mics, Zoltán; D'’Angio, Andrea; Jensen, Søren A.

    2013-01-01

    —In a series of systematic optical pump - terahertz probe experiments we study the density-dependent electron scattering rate in photoexcited GaAs in a large range of carrier densities. The electron scattering time decreases by as much as a factor of 4, from 320 to 60 fs, as the electron density...

  3. Status of GaAs solar cell production

    Science.gov (United States)

    Yeh, Milton; Ho, Frank; Iles, Peter A.

    1989-01-01

    Recent experience in producing GaAs solar cells, to meet the full requirements of space-array manufacturers is reviewed. The main problems have been in extending MOCVD technology to provide high throughput of high quality epitaxial layers, and to integrate the other important factors needed to meet the full range of user requirements. Some discussion of evolutionary changes is also given.

  4. First results from the LHC Schottky Monitor operated with Direct Diode Detection

    CERN Document Server

    Gasior, M

    2012-01-01

    The LHC is equipped with a Schottky diagnostic system based on 4.8 GHz resonant pick-ups. Their signals are processed according to a three-stage down-mixing scheme, working well in most beam conditions. An important exception is the period of energy ramp of proton beams, when the noise floor of the observed beam spectrum increases dramatically and the Schottky sidebands disappear. To study beam spectra in such conditions the signals from the Schottky pick-ups were split and the second half of their power was processed with a copy of the LHC tune measurement electronics, modified for this application. The experimental set-up is based on simple diode detectors followed by signal processing in the kHz range and 24-bit audio ADCs. With such a test system LHC beam spectra were successfully observed. This contribution presents the used hardware and obtained results.

  5. ON current enhancement of nanowire Schottky barrier tunnel field effect transistors

    Science.gov (United States)

    Takei, Kohei; Hashimoto, Shuichiro; Sun, Jing; Zhang, Xu; Asada, Shuhei; Xu, Taiyu; Matsukawa, Takashi; Masahara, Meishoku; Watanabe, Takanobu

    2016-04-01

    Silicon nanowire Schottky barrier tunnel field effect transistors (NW-SBTFETs) are promising structures for high performance devices. In this study, we fabricated NW-SBTFETs to investigate the effect of nanowire structure on the device characteristics. The NW-SBTFETs were operated with a backgate bias, and the experimental results demonstrate that the ON current density is enhanced by narrowing the width of the nanowire. We confirmed using the Fowler-Nordheim plot that the drain current in the ON state mainly comprises the quantum tunneling component through the Schottky barrier. Comparison with a technology computer aided design (TCAD) simulation revealed that the enhancement is attributed to the electric field concentration at the corners of cross-section of the NW. The study findings suggest an effective approach to securing the ON current by Schottky barrier width modulation.

  6. Time response of GaN Schottky detector for X-ray detection

    International Nuclear Information System (INIS)

    Fu Kai; Yu Guohao; Lu Min

    2010-01-01

    Time response of GaN Schottky detector with a large area to X-ray was studied. Using a Fe-doped GaN high resistive film to make the detector, the time response under different bias was tested. For the measured results, a theoretical model of time response of GaN Schottky detector to X-ray irradiation was proposed, and its internal mechanism was studied with a very good fitting results. It is found, due to the presence of high resistivity layer, the GaN Schottky detector can have a high signal to noise ratio of about 80 at reverse bias of 200 V, even in the possible effects of light quenching. (authors)

  7. On-Chip Power-Combining for High-Power Schottky Diode Based Frequency Multipliers

    Science.gov (United States)

    Siles Perez, Jose Vicente (Inventor); Chattopadhyay, Goutam (Inventor); Lee, Choonsup (Inventor); Schlecht, Erich T. (Inventor); Jung-Kubiak, Cecile D. (Inventor); Mehdi, Imran (Inventor)

    2015-01-01

    A novel MMIC on-chip power-combined frequency multiplier device and a method of fabricating the same, comprising two or more multiplying structures integrated on a single chip, wherein each of the integrated multiplying structures are electrically identical and each of the multiplying structures include one input antenna (E-probe) for receiving an input signal in the millimeter-wave, submillimeter-wave or terahertz frequency range inputted on the chip, a stripline based input matching network electrically connecting the input antennas to two or more Schottky diodes in a balanced configuration, two or more Schottky diodes that are used as nonlinear semiconductor devices to generate harmonics out of the input signal and produce the multiplied output signal, stripline based output matching networks for transmitting the output signal from the Schottky diodes to an output antenna, and an output antenna (E-probe) for transmitting the output signal off the chip into the output waveguide transmission line.

  8. The controlled growth of graphene nanowalls on Si for Schottky photodetector

    Directory of Open Access Journals (Sweden)

    Quan Zhou

    2017-12-01

    Full Text Available Schottky diode with directly-grown graphene on silicon substrate has advantage of clean junction interface, promising for photodetectors with high-speed and low noise. In this report, we carefully studied the influence of growth parameters on the junction quality and photoresponse of graphene nanowalls (GNWs-based Schottky photodetectors. We found that shorter growth time is critical for lower dark current, but at the same time higher photocurrent. The influence of growth parameters was attributed to the defect density of various growth time, which results in different degrees of surface absorption for H2O/O2 molecules and P-type doping level. Raman characterization and vacuum annealing treatment were carried out to confirm the regulation mechanism. Meanwhile, the release of thermal stress also makes the ideality factor η of thinner sample better than the thicker. Our results are important for the response improvement of photodetectors with graphene-Si schottky junction.

  9. Ru Schottky barrier contacts to n- and p-type 6H-SiC

    Energy Technology Data Exchange (ETDEWEB)

    Samiji, M.E.; Wyk, E. van; Wu, L.; Leitch, A.W.R. [Port Elizabeth Univ. (South Africa). Dept. of Physics; Venter, A. [Vista Univ., Port Elizabeth (South Africa). Dept. of Physics

    2001-07-01

    We have investigated the formation of ruthenium Schottky contacts on both n- and p-type 6H-SiC wafers. It is found that Ru forms good quality rectifying contacts, with barrier heights of 0.67 eV and 1.06 eV for n-type and p-type SiC, respectively and ideality factors in the range 1.4 - 1.6. Annealing experiments indicated that the Ru Schottky contacts remained stable up to 450 C, above which a general deterioration in the quality of the contacts (as indicated by an increase in the measured idealities as well as an increase in the reverse bias leakage currents) was observed. It is also shown that the Ru Schottky contact to p-type SiC provides an excellent means through which to introduce hydrogen into the SiC using a hydrogen plasma. (orig.)

  10. High performance Schottky diodes based on indium-gallium-zinc-oxide

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Jiawei; Song, Aimin, E-mail: A.Song@manchester.ac.uk [School of Electrical and Electronic Engineering, University of Manchester, Manchester M13 9PL (United Kingdom); Xin, Qian [School of Physics, Shandong University, Jinan 250100 (China)

    2016-07-15

    Indium-gallium-zinc-oxide (IGZO) Schottky diodes exhibit excellent performance in comparison with conventional devices used in future flexible high frequency electronics. In this work, a high performance Pt IGZO Schottky diode was presented by using a new fabrication process. An argon/oxygen mixture gas was introduced during the deposition of the Pt layer to reduce the oxygen deficiency at the Schottky interface. The diode showed a high barrier height of 0.92 eV and a low ideality factor of 1.36 from the current–voltage characteristics. Even the radius of the active area was 0.1 mm, and the diode showed a cut-off frequency of 6 MHz in the rectifier circuit. Using the diode as a demodulator, a potential application was also demonstrated in this work.

  11. Prediction of barrier inhomogeneities and carrier transport in Ni-silicided Schottky diode

    International Nuclear Information System (INIS)

    Saha, A.R.; Dimitriu, C.B.; Horsfall, A.B.; Chattopadhyay, S.; Wright, N.G.; O'Neill, A.G.; Maiti, C.K.

    2006-01-01

    Based on Quantum Mechanical (QM) carrier transport and the effects of interface states, a theoretical model has been developed to predict the anomalous current-voltage (I-V) characteristics of a non-ideal Ni-silicided Schottky diode at low temperatures. Physical parameters such as barrier height, ideality factor, series resistance and effective Richardson constant of a silicided Schottky diode were extracted from forward I-V characteristics and are subsequently used for the simulation of both forward and reverse I-V characteristics using a QM transport model in which the effects of interface state and bias dependent barrier reduction are incorporated. The present analysis indicates that the effects of barrier inhomogeneity caused by incomplete silicide formation at the junction and the interface states may change the conventional current transport process, leading to anomalous forward and reverse I-V characteristics for the Ni-silicided Schottky diode

  12. The controlled growth of graphene nanowalls on Si for Schottky photodetector

    Science.gov (United States)

    Zhou, Quan; Liu, Xiangzhi; Zhang, Enliang; Luo, Shi; Shen, Jun; Wang, Yuefeng; Wei, Dapeng

    2017-12-01

    Schottky diode with directly-grown graphene on silicon substrate has advantage of clean junction interface, promising for photodetectors with high-speed and low noise. In this report, we carefully studied the influence of growth parameters on the junction quality and photoresponse of graphene nanowalls (GNWs)-based Schottky photodetectors. We found that shorter growth time is critical for lower dark current, but at the same time higher photocurrent. The influence of growth parameters was attributed to the defect density of various growth time, which results in different degrees of surface absorption for H2O/O2 molecules and P-type doping level. Raman characterization and vacuum annealing treatment were carried out to confirm the regulation mechanism. Meanwhile, the release of thermal stress also makes the ideality factor η of thinner sample better than the thicker. Our results are important for the response improvement of photodetectors with graphene-Si schottky junction.

  13. On the alleviation of Fermi-level pinning by ultrathin insulator layers in Schottky contacts

    Science.gov (United States)

    Mönch, Winfried

    2012-04-01

    With a few exceptions, metal-semiconductor or Schottky contacts are rectifying. Intimate n-Ge Schottky contacts are the most extreme example in that their barrier heights are almost independent of the metal used. Such behavior is characterized as pinning of the Fermi level. Quite recently, ultrathin insulator layers placed between the metal and the semiconductor were found to lower the barrier heights of Schottky contacts and to increase their dependence on the metals used. In this way ohmic behavior was achieved without alloying. The barrier heights of intimate Schottky contacts and the valence-band offsets of heterostructures are well described by the intrinsic interface-induced gap states (IFIGS). Insulators fit in this concept because they are large-gap semiconductors. This article demonstrates that the IFIGS concept also explains the experimentally observed alleviation of the Fermi-level pinning or, as it is also addressed, the Fermi-level depinning in metal-ultrathin insulator-semiconductor or MUTIS structures. Their barrier heights are determined by the IFIGS branch-point energy of the semiconductor and the dependence of the barrier heights of the insulator Schottky contacts on the metals used. Furthermore, saturation of the semiconductor dangling bonds by, for example, sulfur or hydrogen adatoms prior to the deposition of the metals also reduces or increases the barrier heights of Schottky contacts irrespective of the metals applied. In other words, no alleviation of the Fermi-level pinning or depinning occurs. These modifications of the barrier heights are explained by the partial ionic character of the covalent bonds between the adatoms and the semiconductor atoms at the interface, i.e., by an extrinsic electric-dipole layer.

  14. Spin dynamics in GaAs and (110)-GaAs heterostructures; Spindynamik in GaAs und (110)-GaAs-Heterostrukturen

    Energy Technology Data Exchange (ETDEWEB)

    Oertel, Stefan

    2012-07-01

    This thesis investigates the spin dynamics in both bulk GaAs and (llO)GaAs heterostructures using time- and polarization-resolved photoluminescence spectroscopy. In bulk GaAs the spin relaxation t ime is measured for the first time in the high temperature regime from 280 K to 400 K and is compared to numerical calculations. The numerical calculations are based on the spin relaxation theory of the Dyakonov-Perel mechanism effected by momentum scattering with polar optical phonons and electron-electron scattering and are in good agreement with the experimental results. Measurements of the dependence on the electron density serve to determine the energy dependent proportional factor between the electron density and the effective electron-electron scattering time. Also in bulk GaAs the interaction between the electron spin system and the nuclear spin system is investigated. The measured electron Lande g-factor under the influence of the nuclear magnetic field is used as an indicator to monitor the temporal evolution of the nuclear magnetic field under sustained dynamic nuclear polarization. Measurements with polarization modulated excitation enable the determination of the relevant time scale at which dynamic nuclear polarization takes place. Furthermore, the temporal evolution of the measured electron Lande g-factor shows the complex interplay of the dynamic nuclear polarization, the nuclear spin diffusion and the nuclear spin relaxation. In symmetric (110)-GaAs quantum wells the dependence of the inplane anisotropy of the electron Lande g-factor on the quantum well thickness is determined experimentally. The measurements are in very good agreement with calculations based upon k . p-theory and reveal a maximum of the anisotropy at maximum carrier localization in the quantum well. The origin of the anisotropy that is not present in symmetric (001) quantum wells is qualitatively described by means of a simplified model based on fourth-order perturbation theory. A

  15. The effect of incremental gamma-ray doses and incremental neutron fluences upon the performance of self-biased sup 1 sup 0 B-coated high-purity epitaxial GaAs thermal neutron detectors

    CERN Document Server

    Gersch, H K; Simpson, P A

    2002-01-01

    High-purity epitaxial GaAs sup 1 sup 0 B-coated thermal neutron detectors advantageously operate at room temperature without externally applied voltage. Sample detectors were systematically irradiated at fixed grid locations near the core of a 2 MW research reactor to determine their operational neutron dose threshold. Reactor pool locations were assigned so that fast and thermal neutron fluxes to the devices were similar. Neutron fluences ranged between 10 sup 1 sup 1 and 10 sup 1 sup 4 n/cm sup 2. GaAs detectors were exposed to exponential fluences of base ten. Ten detector designs were irradiated and studied, differentiated between p-i-n diodes and Schottky barrier diodes. The irradiated sup 1 sup 0 B-coated detectors were tested for neutron detection sensitivity in a thermalized neutron beam. Little damage was observed for detectors irradiated at neutron fluences of 10 sup 1 sup 2 n/cm sup 2 and below, but signals noticeably degraded at fluences of 10 sup 1 sup 3 n/cm sup 2. Catastrophic damage was appare...

  16. Characterization of plasma etching damage on p -type GaN using Schottky diodes

    OpenAIRE

    Masashi, Kato; K., Mikamo; Masaya, Ichimura; M., Kanechika; O., Ishiguro; T., Kachi

    2008-01-01

    The plasma etching damage in p-type GaN has been characterized. From current-voltage and capacitance-voltage characteristics of Schottky diodes, it was revealed that inductively coupled plasma (ICP) etching causes an increase in series resistance of the Schottky diodes and compensation of acceptors in p-type GaN. We investigated deep levels near the valence band of p-type GaN using current deep level transient spectroscopy (DLTS), and no deep level originating from the ICP etching damage was ...

  17. Metal contacts in nanocrystalline n-type GaN: Schottky diodes.

    Science.gov (United States)

    Das, S N; Sarangi, S; Sahu, S N; Pal, A K

    2009-04-01

    Contact properties in nanocrystalline n-GaN in thin film form were studied by depositing nanocrystalline films onto aluminium coated fused silica substrates by high pressure sputtering of Si (1 at%) doped GaN target. Schottky diodes were realized with Au, Ni and Pd as top contacts on the nanocrystalline n-GaN films to examine the contact properties of the diodes thus formed. Variation of current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the Schottky diodes were recorded at different temperatures and analyzed in the light of the existing theories.

  18. Physical Mechanisms Responsible for Electrical Conduction in Pt/GaN Schottky Diodes

    Directory of Open Access Journals (Sweden)

    H. MAZARI

    2014-05-01

    Full Text Available The current-voltage (I-V characteristics of Pt/(n.u.d-GaN and Pt/Si-doped-GaN diodes Schottky are investigated. Based on these measurements, physical mechanisms responsible for electrical conduction have been suggested. The contribution of thermionic-emission current and various other current transport mechanisms were assumed when evaluating the Schottky barrier height. Thus the generation-recombination, tunneling and leakage currents caused by inhomogeneities and defects at metal-semiconductor interface were taken into account.

  19. Optimized design of 4H-SiC floating junction power Schottky barrier diodes

    Science.gov (United States)

    Hongbin, Pu; Lin, Cao; Zhiming, Chen; Jie, Ren

    2009-04-01

    SiC floating junction Schottky barrier diodes were simulated with software MEDICI 4.0 and their device structures were optimized based on forward and reverse electrical characteristics. Compared with the conventional power Schottky barrier diode, the device structure is featured by a highly doped drift region and embedded floating junction region, which can ensure high breakdown voltage while keeping lower specific on-state resistance, solved the contradiction between forward voltage drop and breakdown voltage. The simulation results show that with optimized structure parameter, the breakdown voltage can reach 4 kV and the specific on-resistance is 8.3 mΩ·cm2.

  20. Optimized design of 4H-SiC floating junction power Schottky barrier diodes

    International Nuclear Information System (INIS)

    Pu Hongbin; Cao Lin; Chen Zhiming; Ren Jie

    2009-01-01

    SiC floating junction Schottky barrier diodes were simulated with software MEDICI 4.0 and their device structures were optimized based on forward and reverse electrical characteristics. Compared with the conventional power Schottky barrier diode, the device structure is featured by a highly doped drift region and embedded floating junction region, which can ensure high breakdown voltage while keeping lower specific on-state resistance, solved the contradiction between forward voltage drop and breakdown voltage. The simulation results show that with optimized structure parameter, the breakdown voltage can reach 4 kV and the specific on-resistance is 8.3 mΩ·cm 2 .

  1. Full wave analysis of non-radiative dielectric waveguide modulator ...

    Indian Academy of Sciences (India)

    This paper reports the determination of electrical equivalent circuit of ON/OFF modulator in non-radiative dielectric (NRD) guide configurations at Ka-band. Schottky barrier mixer diode is used to realize this modulator and its characteristics are determined experimentally using vector network analyzer. Full wave FEM ...

  2. A Novel Approach to Modeling the Effects of Radiation in Gallium-Arsenide Solar Cells Using Silvaco's ATLAS Software

    National Research Council Canada - National Science Library

    Crespin, Aaron

    2004-01-01

    The effects of radiation in GaAs solar cells has been extensively researched and the results of numerous investigation have yielded a considerable amount of information about the degradation in irradiated solar cells...

  3. Determination of the series resistance under the Schottky contacts of AlGaN/AlN/GaN Schottky barrier diodes

    International Nuclear Information System (INIS)

    Cao Zhi-Fang; Lin Zhao-Jun; Lü Yuan-Jie; Luan Chong-Biao; Yu Ying-Xia; Chen Hong; Wang Zhan-Guo

    2012-01-01

    Rectangular AlGaN/AlN/GaN heterostructure field-effect transistors (HFETs) were fabricated, and the gate and the source of the HFETs consisted of AlGaN/AlN/GaN Schottky barrier diodes (SBDs). Based on the measured forward current-voltage and the capacitance-voltage characteristics of the AlGaN/AlN/GaN SBDs, the series resistance under the Schottky contacts (R S ) was calculated using the method of power consumption, which has been proved to be valid. Finally, the method of power consumption for calculating R S was successfully used to study the two-dimensional electron gas electron mobility for a series of circular AlGaN/AlN/GaN SBDs. It is shown that the series resistance under the Schottky contacts cannot be neglected and is important for analysing and characterizing the AlGaN/AlN/GaN SBDs and the AlGaN/AlN/GaN HFETs. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  4. Multiple Schottky Barrier-Limited Field-Effect Transistors on a Single Silicon Nanowire with an Intrinsic Doping Gradient.

    Science.gov (United States)

    Barreda, Jorge L; Keiper, Timothy D; Zhang, Mei; Xiong, Peng

    2017-04-05

    In comparison to conventional (channel-limited) field-effect transistors (FETs), Schottky barrier-limited FETs possess some unique characteristics which make them attractive candidates for some electronic and sensing applications. Consequently, modulation of the nano Schottky barrier at a metal-semiconductor interface promises higher performance for chemical and biomolecular sensor applications when compared to conventional FETs with ohmic contacts. However, the fabrication and optimization of devices with a combination of ideal ohmic and Schottky contacts as the source and drain, respectively, present many challenges. We address this issue by utilizing Si nanowires (NWs) synthesized by a chemical vapor deposition process which yields a pronounced doping gradient along the length of the NWs. Devices with a series of metal contacts on a single Si NW are fabricated in a single lithography and metallization process. The graded doping profile of the NW is manifested in monotonic increases in the channel and junction resistances and variation of the nature of the contacts from ohmic to Schottky of increasing effective barrier height along the NW. Hence multiple single Schottky junction-limited FETs with extreme asymmetry and high reproducibility are obtained on an individual NW. A definitive correlation between increasing Schottky barrier height and enhanced gate modulation is revealed. Having access to systematically varying Schottky barrier contacts on the same NW device provides an ideal platform for identifying optimal device characteristics for sensing and electronic applications.

  5. Resistance Fluctuations in GaAs Nanowire Grids

    Directory of Open Access Journals (Sweden)

    Ivan Marasović

    2014-01-01

    Full Text Available We present a numerical study on resistance fluctuations in a series of nanowire-based grids. Each grid is made of GaAs nanowires arranged in parallel with metallic contacts crossing all nanowires perpendicularly. Electrical properties of GaAs nanowires known from previous experimental research are used as input parameters in the simulation procedure. Due to the nonhomogeneous doping, the resistivity changes along nanowire. Allowing two possible nanowire orientations (“upwards” or “downwards”, the resulting grid is partially disordered in vertical direction which causes resistance fluctuations. The system is modeled using a two-dimensional random resistor network. Transfer-matrix computation algorithm is used to calculate the total network resistance. It is found that probability density function (PDF of resistance fluctuations for a series of nanowire grids changes from Gaussian behavior towards the Bramwell-Holdsworth-Pinton distribution when both nanowire orientations are equally represented in the grid.

  6. GaAs nanocrystals: Structure and vibrational properties

    International Nuclear Information System (INIS)

    Nayak, J.; Sahu, S.N.; Nozaki, S.

    2006-01-01

    GaAs nanocrystals were grown on indium tin oxide substrate by an electrodeposition technique. Atomic force microscopic measurement indicates an increase in the size of the nanocrystal with decrease in the electrolysis current density accompanied by the change in the shape of the crystallite. Transmission electron microscopic measurements identify the crystallite sizes to be in the range of 10-15 nm and the crystal structure to be orthorhombic. On account of the quantum size effect, the first optical transition was blue shifted with respect to the band gap of the bulk GaAs and the excitonic peak appeared prominent. A localized phonon mode ascribed to certain point defect occurred in the room temperature micro-Raman spectrum

  7. Testing a GaAs cathode in SRF gun

    International Nuclear Information System (INIS)

    Wang, E.; Kewisch, J.; Ben-Zvi, I.; Burrill, A.; Rao, T.; Wu, Q.; Holmes, D.

    2011-01-01

    RF electron guns with a strained superlattice GaAs cathode are expected to generate polarized electron beams of higher brightness and lower emittance than do DC guns, due to their higher field gradient at the cathode's surface and lower cathode temperature. We plan to install a bulk GaAs:Cs in a SRF gun to evaluate the performance of both the gun and the cathode in this environment. The status of this project is: In our 1.3 GHz 1/2 cell SRF gun, the vacuum can be maintained at nearly 10 -12 Torr because of cryo-pumping at 2K. With conventional activation of bulk GaAs, we obtained a QE of 10% at 532 nm, with lifetime of more than 3 days in the preparation chamber and have shown that it can survive in transport from the preparation chamber to the gun. The beam line has been assembled and we are exploring the best conditions for baking the cathode under vacuum. We report here the progress of our test of the GaAs cathode in the SRF gun. Future particle accelerators, such as eRHIC and the ILC require high-brightness, high-current polarized electrons. Strained superlattice GaAs:Cs has been shown to be an efficient cathode for producing polarized electrons. Activation of GaAs with Cs,O(F) lowers the electron affinity and makes it energetically possible for all the electrons, excited into the conduction band that drift or diffuse to the emission surface, to escape into the vacuum. Presently, all operating polarized electron sources, such as the CEBAF, are DC guns. In these devices, the excellent ultra-high vacuum extends the lifetime of the cathode. However, the low field gradient on the photocathode's emission surface of the DC guns limits the beam quality. The higher accelerating gradients, possible in the RF guns, generate a far better beam. Until recently, most RF guns operated at room temperature, limiting the vacuum to ∼10 -9 Torr. This destroys the GaAs's NEA surface. The SRF guns combine the excellent vacuum conditions of DC guns and the high accelerating

  8. A high-speed Schottky detector for ultra-wideband communications

    DEFF Research Database (Denmark)

    Valdecasa, Guillermo Silva; Cimoli, Bruno; Blanco Granja, Ángel

    2017-01-01

    This letter reviews the design procedure of a high‐speed Schottky video detector for high‐data‐rate communications within the ultra‐wideband (UWB) frequencies. The classic design approach for video detectors is extended with a mixer‐like analysis, which results in a more detailed assessment...

  9. Limitations in THz Power Generation with Schottky Diode Varactor Frequency Multipliers

    DEFF Research Database (Denmark)

    Krozer, Viktor; Loata, G.; Grajal, J.

    2002-01-01

    We discuss the limitations in power generation with Schottky diode and HBV (heterostructure barrier varactor) diode frequency multipliers. It is shown that at lower frequencies the experimental results achieved so far approach the theoretical limit of operation for the employed devices. However...

  10. Energetic initiators with narrow firing thresholds using Al/CuO Schottky junctions

    Science.gov (United States)

    Wang, Feng; Zhu, Peng; Li, Jie; Hu, Bo; Shen, Ruiqi; Ye, Yinghua

    2016-07-01

    We designed and prepared Schottky-junction-based Al/CuO energetic initiators with narrow firing thresholds according to Schottky barrier theory. Using various characterization methods, we preliminarily investigated the electrical breakdown property, withstand strike current ability, and multiple-firing performance of the energetic initiators. The breakdown voltage of the Al/CuO Schottky junction was ~8 V; and electrical breakdown in the initiators occurred one by one rather than simultaneously. The withstand strike current ability of the initiator mainly depended on the heat capacity of its ceramic plug when the electrical stimulus is more than ~8 V, its breakdown voltage. The ceramic plug can absorb heat from the initiator chip, letting the initiator withstand a constant current of 0.5 A for 20 s. More importantly, the initiators might be able to withstand hard electromagnetic interference by coupling the multiple-firing performance with an out-of-line slider in the explosive train. This knowledge of the characteristics of Schottky-junction-based Al/CuO energetic initiators will help in preparing highly insensitive, efficient initiating explosive devices for weapon systems.

  11. Utilizing Schottky barriers to suppress short-channel effects in organic transistors

    Science.gov (United States)

    Fernández, Anton F.; Zojer, Karin

    2017-10-01

    Transistors with short channel lengths exhibit profound deviations from the ideally expected behavior. One of the undesired short-channel effects is an enlarged OFF current that is associated with a premature turn on of the transistor. We present an efficient approach to suppress the OFF current, defined as the current at zero gate source bias, in short-channel organic transistors. We employ two-dimensional device simulations based on the drift-diffusion model to demonstrate that intentionally incorporating a Schottky barrier for injection enhances the ON-OFF ratio in both staggered and coplanar transistor architectures. The Schottky barrier is identified to directly counteract the origin of enlarged OFF currents: Short channels promote a drain-induced barrier lowering. The latter permits unhindered injection of charges even at reverse gate-source bias. An additional Schottky barrier hampers injection for such points of operations. We explain how it is possible to find the Schottky barrier of the smallest height necessary to exactly compensate for the premature turn on. This approach offers a substantial enhancement of the ON-OFF ratio. We show that this roots in the fact that such optimal barrier heights offer an excellent compromise between an OFF current diminished by orders of magnitude and an only slightly reduced ON current.

  12. Schottky barriers based on metal nanoparticles deposited on InP epitaxial layers

    Czech Academy of Sciences Publication Activity Database

    Grym, Jan; Yatskiv, Roman

    2013-01-01

    Roč. 28, č. 4 (2013) ISSN 0268-1242 R&D Projects: GA MŠk LD12014 Institutional support: RVO:67985882 Keywords : Colloidal graphite * Epitaxial growth * Schottky barrier diodes Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 2.206, year: 2013

  13. Thin-film GaN Schottky diodes formed by epitaxial lift-off

    Science.gov (United States)

    Wang, Jingshan; Youtsey, Chris; McCarthy, Robert; Reddy, Rekha; Allen, Noah; Guido, Louis; Xie, Jinqiao; Beam, Edward; Fay, Patrick

    2017-04-01

    The performance of thin-film GaN Schottky diodes fabricated using a large-area epitaxial lift-off (ELO) process is reported in this work. Comparison of the device characteristics before and after lift-off processing reveals that the Schottky barrier height remains unchanged by the liftoff processing and is consistent with expectations based on metal-semiconductor work function differences, with a barrier height of approximately 1 eV obtained for Ni/Au contacts on n- GaN. However, the leakage current in both reverse and low-forward-bias regimes is found to improve significantly after ELO processing. Likewise, the ideality factor of the Schottky diodes also improves after ELO processing, decreasing from n = 1.12-1.18 before ELO to n = 1.04-1.10 after ELO. A possible explanation for the performance improvement obtained for Schottky diodes after substrate removal by ELO processing is the elimination of leakage paths consisting of vertical leakage along threading dislocations coupled with lateral conduction through the underlying n+ buffer layer that is removed in the ELO process. Epitaxial liftoff with GaN may enable significant improvement in device performance and economics for GaN-based electronics and optoelectronics.

  14. Schottky barrier tuning via dopant segregation in NiGeSn-GeSn contacts

    Science.gov (United States)

    Schulte-Braucks, Christian; Hofmann, Emily; Glass, Stefan; von den Driesch, Nils; Mussler, Gregor; Breuer, Uwe; Hartmann, Jean-Michel; Zaumseil, Peter; Schröder, Thomas; Zhao, Qing-Tai; Mantl, Siegfried; Buca, Dan

    2017-05-01

    We present a comprehensive study on the formation and tuning of the Schottky barrier of NiGeSn metallic alloys on Ge1-xSnx semiconductors. First, the Ni metallization of GeSn is investigated for a wide range of Sn contents (x = 0-0.125). Structural analysis reveals the existence of different poly-crystalline NiGeSn and Ni3(GeSn)5 phases depending on the Sn content. Electrical measurements confirm a low NiGeSn sheet resistance of 12 Ω/□ almost independent of the Sn content. We extracted from Schottky barrier height measurements in NiGeSn/GeSn/NiGeSn metal-semiconductor-metal diodes Schottky barriers for the holes below 0.15 eV. They decrease with the Sn content, thereby confirming NiGeSn as an ideal metal alloy for p-type contacts. Dopant segregation for both p- and n-type dopants is investigated as a technique to effectively modify the Schottky barrier of NiGeSn/GeSn contacts. Secondary ion mass spectroscopy is employed to analyze dopant segregation and reveal its dependence on both the Sn content and biaxial layer strain.

  15. The Effect of Bilayer Graphene Nanoribbon Geometry on Schottky-Barrier Diode Performance

    Directory of Open Access Journals (Sweden)

    Meisam Rahmani

    2013-01-01

    Full Text Available Bilayer graphene nanoribbon is a promising material with outstanding physical and electrical properties that offers a wide range of opportunities for advanced applications in future nanoelectronics. In this study, the application of bilayer graphene nanoribbon in schottky-barrier diode is explored due to its different stacking arrangements. In other words, bilayer graphene nanoribbon schottky-barrier diode is proposed as a result of contact between a semiconductor (AB stacking and metal (AA stacking layers. To this end, an analytical model joint with numerical solution of carrier concentration for bilayer graphene nanoribbon in the degenerate and nondegenerate regimes is presented. Moreover, to determine the proposed diode performance, the carrier concentration model is adopted to derive the current-voltage characteristic of the device. The simulated results indicate a strong bilayer graphene nanoribbon geometry and temperature dependence of current-voltage characteristic showing that the forward current of the diode rises by increasing of width. In addition, the lower value of turn-on voltage appears as the more temperature increases. Finally, comparative study indicates that the proposed diode has a better performance compared to the silicon schottky diode, graphene nanoribbon homo-junction contact, and graphene-silicon schottky diode in terms of electrical parameters such as turn-on voltage and forward current.

  16. Thermal stability of Pd Schottky contacts to p-type 6H-SiC

    Energy Technology Data Exchange (ETDEWEB)

    Samiji, M.E.; Leitch, A.W.R. [Dept. of Physics, Univ. of Port Elizabeth (South Africa); Venter, A. [Dept. of Physics, Vista Univ., Port Elizabeth (South Africa)

    2003-07-01

    The thermal stability of palladium (Pd) Schottky barrier diodes fabricated on bulk p-type Al-doped (5-8 x 10{sup 17} cm{sup -3}) 6H-SiC is reported. Isochronal anneals revealed a steady improvement in the as-deposited Pd contacts for temperatures up to 250-300 C, above which the quality progressively deteriorated. Above 600 C the contacts became unusable. The effect of hydrogen on the Pd Schottky diode was investigated by exposing the Pd metallized surface of the SiC to a hydrogen plasma. It was found that Pd became permeable to hydrogen around 250 C, resulting in a subsequent introduction of hydrogen into the near-surface region of the SiC. Capacitance-voltage (C-V) depth profiles of the H-plasma exposed diodes revealed a partial reduction in the near-surface free carrier concentration, suggesting passivation of the Al acceptors by hydrogen. This was confirmed by subsequent reactivation of the electrical activity of the Schottky contact through a series of isothermal reverse bias annealing experiments. Hydrogen was also found to improve the thermal stability of the Pd Schottky diode. (orig.)

  17. C-V characterization of Schottky- and MIS-gate SiGe/Si HEMT structures

    International Nuclear Information System (INIS)

    Onojima, Norio; Kasamatsu, Akihumi; Hirose, Nobumitsu; Mimura, Takashi; Matsui, Toshiaki

    2008-01-01

    Electrical properties of Schottky- and metal-insulator-semiconductor (MIS)-gate SiGe/Si high electron mobility transistors (HEMTs) were investigated with capacitance-voltage (C-V) measurements. The MIS-gate HEMT structure was fabricated using a SiN gate insulator formed by catalytic chemical vapor deposition (Cat-CVD). The Cat-CVD SiN thin film (5 nm) was found to be an effective gate insulator with good gate controllability and dielectric properties. We previously investigated device characteristics of sub-100-nm-gate-length Schottky- and MIS-gate HEMTs, and reported that the MIS-gate device had larger maximum drain current density and transconductance (g m ) than the Schottky-gate device. The radio frequency (RF) measurement of the MIS-gate device, however, showed a relatively lower current gain cutoff frequency f T compared with that of the Schottky-gate device. In this study, C-V characterization of the MIS-gate HEMT structure demonstrated that two electron transport channels existed, one at the SiGe/Si buried channel and the other at the SiN/Si surface channel

  18. Low Schottky Barrier Black Phosphorus Field-Effect Devices with Ferromagnetic Tunnel Contacts

    NARCIS (Netherlands)

    Kamalakar, M Venkata; Bettadahalli Nandishaiah, Madhushankar; Dankert, André; Dash, Saroj P

    2015-01-01

    Black phosphorus (BP) has been recently unveiled as a promising 2D direct bandgap semiconducting material. Here, ambipolar field-effect transistor behavior of nanolayers of BP with ferromagnetic tunnel contacts is reported. Using TiO2 /Co contacts, a reduced Schottky barrier <50 meV, which can be

  19. Plasmonic silicon Schottky photodetectors: the physics behind graphene enhanced internal photoemission

    DEFF Research Database (Denmark)

    Levy, Uriel; Grajower, Meir; Gonçalves, P. A. D.

    2017-01-01

    a physical model where surface plasmon polaritons enhance the absorption in a single-layer graphene by enhancing the field along the interface. The relatively long relaxation time in graphene allows for multiple attempts for the carrier to overcome the Schottky barrier and penetrate into the semiconductor...

  20. Comparison of magnetic and electrostatic Schottky pick-up in the CERN AD

    CERN Document Server

    Federmann, S

    2013-01-01

    The present note is intended to exploit the possibility of using a dedicated electrostatic beam pick-up for Schottky diagnostics in the future ELENA ring. A test setup is described allowing the evaluation of its performance compared to the extra low-noise beam current transformer used successfully in the AD. The results of this experiment are summarized and discussed.

  1. On the modelling and optimisation of a novel Schottky based silicon rectifier

    NARCIS (Netherlands)

    van Hemert, T.; Hueting, Raymond Josephus Engelbart; Rajasekharan, B.; Salm, Cora; Schmitz, Jurriaan

    2010-01-01

    The charge plasma (CP) diode is a novel silicon rectifier using Schottky barriers, to circumvent the requirement for doping and related problems when small device dimensions are used. We present a model for the DC current voltage characteristics and verify this using device simulations. The model

  2. Atomic composition of WC/ and Zr/O-terminated diamond Schottky interfaces close to ideality

    Energy Technology Data Exchange (ETDEWEB)

    Piñero, J.C., E-mail: josecarlos.pinero@uca.es [Dpto. Ciencias de los Materiales, Universidad de Cádiz, Puerto Real, Cádiz,11510 (Spain); Araújo, D. [Dpto. Ciencias de los Materiales, Universidad de Cádiz, Puerto Real, Cádiz,11510 (Spain); Fiori, A. [National Institute for Materials Science, Tsukuba, Ibaraki (Japan); Traoré, A. [Institut Néel, CNRS-UJF, av. des Martyrs, Grenoble,38042 France (France); Villar, M.P. [Dpto. Ciencias de los Materiales, Universidad de Cádiz, Puerto Real, Cádiz,11510 (Spain); Eon, D.; Muret, P.; Pernot, J. [Institut Néel, CNRS-UJF, av. des Martyrs, Grenoble,38042 France (France); Teraji, T. [National Institute for Materials Science, Tsukuba, Ibaraki (Japan)

    2017-02-15

    Highlights: • Metal/O-terminated diamond interfaces are analyzed by a variety of TEM techniques. • Thermal treatment is shown to modify structural and chemical interface properties. • Electrical behavior vs annealing is shown to be related with interface modification. • Interfaces are characterized with atomic resolution to probe inhomogeneities. • Oxide formation and modification is demonstrated in both Schottky diodes. - Abstract: Electrical and nano-structural properties of Zr and WC-based Schottky power diodes are compared and used for investigating oxide-related effects at the diamond/metal interface. Differences in Schottky barrier heights and ideality factors of both structures are shown to be related with the modification of the oxygen-terminated diamond/metal interface configuration. Oxide formation, oxide thickness variations and interfacial oxygen redistribution, associated with thermal treatment are demonstrated. Ideality factors close to ideality (n{sub WC} = 1.02 and n{sub Zr} = 1.16) are obtained after thermal treatment and are shown to be related with the relative oxygen content at the surface (OCR{sub WC} = 3.03 and OCR{sub Zr} = 1.5). Indeed, thermal treatment at higher temperatures is shown to promote an escape of oxygen for the case of the WC diode, while it generates a sharper accumulation of oxygen at the metal/diamond interface for the case of Zr diode. Therefore, the metal-oxygen affinity is shown to be a key parameter to improve diamond-based Schottky diodes.

  3. Simulation of electrical characteristics of GaN vertical Schottky diodes

    Science.gov (United States)

    Łukasiak, Lidia; Jasiński, Jakub; Jakubowski, Andrzej

    2016-12-01

    Reverse current of GaN vertical Schottky diodes is simulated using Silvaco ATLAS to optimize the geometry for the best performance. Several physical quantities and phenomena, such as carrier mobility and tunneling mechanism are studied to select the most realistic models. Breakdown voltage is qualitatively estimated based on the maximum electric field in the structure.

  4. Barrier characteristics of Pt/Ru Schottky contacts on n-type GaN ...

    Indian Academy of Sciences (India)

    420 K are shown in figure 1. The current density (J) through a Schottky barrier diode (SBD) at a for- ward bias (V) according to thermionic emission (TE) theory is given by (Sze 1981; Rhoderick and Williams 1988). J = J0 exp. (. qV. nkT. )[ 1 − exp.

  5. Semimetal graphite/ZnO Schottky diodes and their use for hydrogen sensing

    Czech Academy of Sciences Publication Activity Database

    Yatskiv, Roman; Grym, Jan; Žďánský, Karel; Piksová, K.

    2012-01-01

    Roč. 50, č. 10 (2012), s. 3928-3933 ISSN 0008-6223 R&D Projects: GA MŠk(CZ) OC10021 Institutional support: RVO:67985882 Keywords : Schottky diodes * ZnO * Hydrogen sensor Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 5.868, year: 2012

  6. Ultrafast photocurrents and terahertz radiation in gallium arsenide and carbon based nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Prechtel, Hans Leonhard

    2011-08-15

    of about hundred picoseconds. Furthermore, we showed that in optically pumped graphene electromagnetic radiation up to 1THz is generated. We also investigated the time-integrated photocurrent and photoconductance processes of suspended p-doped gallium arsenide nanowires contacted by a focused ion beam deposition technique. The observed photocurrent is generated at the Schottky contacts between the nanowire and metal source-drain electrodes, while the observed photoconductance signal can be explained by a photogating effect induced by optically generated charge carriers located at the surface of the nanowire. Both optoelectronic effects are sensitive to the polarization of the exciting laser field. We furthermore studied the time-resolved photocurrent dynamics of p- doped gallium arsenide nanowires lying on a sapphire substrate and contacted by optical lithography. In the experiments we were able to resolve displacement currents, transport currents of holes, as well as carrier lifetime limited currents. We were able to spatially relate the time-integrated measurements to the time-resolved measurements. We discovered that the time-integrated measurements are dominated by a transport current, which is limited by the recombination lifetime of photo electrons and holes in the GaAs nanowire. The data further suggested that a photo-thermoelectric current is generated in the nanowires for excitation close to the contacts. There, we found a photocurrent with an exponential decay of only a few picoseconds. (orig.)

  7. Epitaxial growth on porous GaAs substrates

    Czech Academy of Sciences Publication Activity Database

    Grym, Jan; Nohavica, Dušan; Gladkov, Petar; Hulicius, Eduard; Pangrác, Jiří; Piksová, K.

    2013-01-01

    Roč. 16, č. 1 (2013), s. 59-64 ISSN 1631-0748 R&D Projects: GA ČR GAP102/10/1201; GA ČR GAP108/10/0253 Institutional support: RVO:67985882 ; RVO:68378271 Keywords : Electrochemical etching * Porous semiconductors * Epitaxial growth * GaAs Subject RIV: BH - Optics, Masers, Lasers; JA - Electronics ; Optoelectronics, Electrical Engineering (FZU-D) Impact factor: 1.483, year: 2013

  8. Gallium arsenide (GaAs) solar cell modeling studies

    Science.gov (United States)

    Heinbockel, J. H.

    1980-01-01

    Various models were constructed which will allow for the variation of system components. Computer studies were then performed using the models constructed in order to study the effects of various system changes. In particular, GaAs and Si flat plate solar power arrays were studied and compared. Series and shunt resistance models were constructed. Models for the chemical kinetics of the annealing process were prepared. For all models constructed, various parametric studies were performed.

  9. Monolithic GaAs surface acoustic wave chemical microsensor array

    Energy Technology Data Exchange (ETDEWEB)

    HIETALA,VINCENT M.; CASALNUOVO,STEPHEN A.; HELLER,EDWIN J.; WENDT,JOEL R.; FRYE-MASON,GREGORY CHARLES; BACA,ALBERT G.

    2000-03-09

    A four-channel surface acoustic wave (SAW) chemical sensor array with associated RF electronics is monolithically integrated onto one GaAs IC. The sensor operates at 690 MHz from an on-chip SAW based oscillator and provides simple DC voltage outputs by using integrated phase detectors. This sensor array represents a significant advance in microsensor technology offering miniaturization, increased chemical selectivity, simplified system assembly, improved sensitivity, and inherent temperature compensation.

  10. Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell

    Science.gov (United States)

    2014-09-01

    Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell by Naresh C Das ARL-TR-7054 September 2014...September 2014 Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell Naresh C Das Sensors and Electron...From - To) 01/02/2014–07/15/2014 4. TITLE AND SUBTITLE Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell 5a

  11. Effect of H+ implantation on the optical properties of semi-insulating GaAs crystals in the IR spectral region

    International Nuclear Information System (INIS)

    Klyui, N. I.; Lozinskii, V. B.; Liptuga, A. I.; Dikusha, V. N.; Oksanych, A. P.; Kogdas’, M. G.; Perekhrest, A. L.; Pritchin, S. E.

    2017-01-01

    The optical properties of semi-insulating GaAs crystals subjected to multienergy hydrogen-ion implantation and treatment in a high-frequency electromagnetic field are studied in the infrared spectral region. It is established that such combined treatment provides a means for substantially increasing the transmittance of GaAs crystals to values characteristic of crystals of high optical quality. On the basis of analysis of the infrared transmittance and reflectance data, Raman spectroscopy data, and atomic-force microscopy data on the surface morphology of the crystals, a physical model is proposed to interpret the effects experimentally observed in the crystals. The model takes into account the interaction of radiation defects with the initial structural defects in the crystals as well as the effect of compensation of defect centers by hydrogen during high-frequency treatment.

  12. Defects and diffusion in Si+ implanted GaAs

    International Nuclear Information System (INIS)

    Jones, K.S.; Robinson, H.G.; Deal, M.D.; Lee, C.C.; Allen, E.L.

    1993-05-01

    The effect of extended defects on the diffusion of ion implanted species is an area of concern in the development of process simulators for GaAs. This study explores the effect of type 1 extended defects including voids and dislocation loops on the diffusion of Si implanted into GaAs. Semi-insulating GaAs wafers were implanted with 1 x 10 14 /cm 2 Si + at implant temperatures between -51 C and 80 C and at energies ranging from 20 keV to 200 keV. SIMS results show that the diffusivity of Si decreases with both increasing implant temperature and increasing implant energy. At the same time extrinsic dislocation loop concentrations also increased. For the implant conditions studied, no voids were observed. The diffusion results can only be reconciled with the TEM results if the dislocation loops are behaving in a reactive rather than proactive manner. In other words, the changes in vacancy concentration that are affecting the diffusivity are also affecting the loop concentration. This model is supported by evidence that Si diffusivity is enhanced over the same time interval the dislocation loops are dissolving which is consistent with the loops having a reactive role. It remains unclear whether the existence of loops significantly affects the total concentration of vacancies and thus diffusion by acting as a competing sink

  13. Metallization systems for stable ohmic contacts to GaAs

    International Nuclear Information System (INIS)

    Tandon, J.L.; Douglas, K.D.; Vendura, G.; Kolawa, E.; So, F.C.T.; Nicolet, M.A.

    1986-01-01

    A metallization scheme to form reproducible and stable ohmic contacts to GaAs is described. The approach is based on the configuration: GaAs/X/Y/Z; where X is a thin metal film (e.g. Pt, Ti, Pd, Ru), Y is an electrically conducting diffusion barrier layer (TiN, W or W/sub 0.7/N/sub 0.3/), and Z is a thick metal layer (e.g. Ag) typically required for bonding or soldering purposes. The value and reproducibility of the contact resistance in these metallization systems results from the uniform steady-state solid-phase reaction of the metal X with GaAs. The stability of the contacts is achieved by the diffusion barrier layer Y, which not only confines the reaction of X with GaAs, but also prevents the top metal layer Z from interfering with this reaction. Applications of such contacts in fabricating stable solar cells are also discussed

  14. Scanning tunneling microscopy study of GaAs(001) surfaces

    Science.gov (United States)

    Xue, Qi-Kun; Hashizume, T.; Sakurai, T.

    1999-03-01

    While GaAs(001) is the most commonly used substrate in fabrication of wireless and opto-electronic devices based on III-V compound semiconductors by molecular beam epitaxy (MBE), metallorganic chemical vapor deposition (MOCVD) and related techniques, its surface structure have been disputed since the beginning of development of the techniques. Invention of scanning tunneling microscopy (STM) has revolutionized the approach of surface/interface investigation, contributing greatly in the atomistic understanding of the GaAs surface phases. This paper reviews the STM studies of principal reconstructions, from As-rich c(4×4), 2×4, 2×6 to Ga-rich 4×2 and 4×6, found on the GaAs (001) surface. These studies, together with advanced theoretical efforts, have helped us to establish a unified structural model for various reconstructions, with which we can now explain most of the observations and long-standing controversies in atomic structures and surface stoichiometries.

  15. Experimental and computational investigation of graphene/SAMs/n-Si Schottky diodes

    Science.gov (United States)

    Aydin, H.; Bacaksiz, C.; Yagmurcukardes, N.; Karakaya, C.; Mermer, O.; Can, M.; Senger, R. T.; Sahin, H.; Selamet, Y.

    2018-01-01

    We have investigated the effect of two different self-assembled monolayers (SAMs) on electrical characteristics of bilayer graphene (BLG)/n-Si Schottky diodes. Novel 4″bis(diphenylamino)-1, 1‧:3″-terphenyl-5‧ carboxylic acids (TPA) and 4,4-di-9H-carbazol-9-yl-1,1‧:3‧1‧-terphenyl-5‧ carboxylic acid (CAR) aromatic SAMs have been used to modify n-Si surfaces. Cyclic voltammetry (CV) and Kelvin probe force microscopy (KPFM) results have been evaluated to verify the modification of n-Si surface. The current-voltage (I-V) characteristics of bare and SAMs modified devices show rectification behaviour verifying a Schottky junction at the interface. The ideality factors (n) from ln(I)-V dependences were determined as 2.13, 1.96 and 2.07 for BLG/n-Si, BLG/TPA/n-Si and BLG/CAR/n-Si Schottky diodes, respectively. In addition, Schottky barrier height (SBH) and series resistance (Rs) of SAMs modified diodes were decreased compared to bare diode due to the formation of a compatible interface between graphene and Si as well as π-π interaction between aromatic SAMs and graphene. The CAR-based device exhibits better diode characteristic compared to the TPA-based device. Computational simulations show that the BLG/CAR system exhibits smaller energy-level-differences than the BLG/TPA, which supports the experimental findings of a lower Schottky barrier and series resistance in BLG/CAR diode.

  16. Annealing temperature effect on electrical characteristics of Co/p-type Si Schottky barrier diodes

    Energy Technology Data Exchange (ETDEWEB)

    Gueler, G. [Department of Physics, Faculty of Education, Adiyaman University, Adiyaman (Turkey); Karatas, S., E-mail: skaratas@ksu.edu.t [Department of Physics, Faculty of Sciences and Arts, University of Kahramanmaras Suetcue Imam, 46100 Kahramanmaras (Turkey); Bakkaloglu, O.F. [Department of Engineering Physics, Faculty of Engineering, University of Gaziantep, 27310 Gaziantep (Turkey)

    2009-05-01

    The electrical characteristics of Co/p-type Si Schottky barrier diodes (SBDs), which were formed at various annealing temperatures from 200 to 600 deg. C, were investigated using current-voltage (I-V) techniques. The Schottky barrier height at 200 deg. C annealing temperature was found to be 0.708 eV (I-V). However, the Schottky barrier height of the Co/p-type Si diode slightly decreases to 0.696 eV (I-V) when the diode was annealed at 300 deg. C for 5 min in N{sub 2} atmosphere. It is noted that the Schottky barrier height increased to 0.765 eV at 400 deg. C, 0.830 eV at 500 deg. C and 0.836 eV at 600 deg. C for 5 min in N{sub 2} atmosphere. This increase was attributed to that the annealing removes the passivation effect of the native oxide layer and reactivates the surface defects which are responsible for the Fermi level pinning. Norde method was also used to extract the barrier height of Co/p-type Si Schottky barrier diodes and the values are 0.704 eV for the 200 deg. C, 0.714 eV at 300 deg. C, 0.80447 eV at 400 deg. C, 0.874 eV at 500 deg. C and 0.874 eV at 600 deg. C which are in good agreement with those obtained by the I-V method.

  17. In2O 3 Nanotower Hydrogen Gas Sensors Based on Both Schottky Junction and Thermoelectronic Emission.

    Science.gov (United States)

    Zheng, Zhao Qiang; Zhu, Lian Feng; Wang, Bing

    2015-12-01

    Indium oxide (In2O3) tower-shaped nanostructure gas sensors have been fabricated on Cr comb-shaped interdigitating electrodes with relatively narrower interspace of 1.5 μm using thermal evaporation of the mixed powders of In2O3 and active carbon. The Schottky contact between the In2O3 nanotower and the Cr comb-shaped interdigitating electrode forms the Cr/In2O3 nanotower Schottky diode, and the corresponding temperature-dependent I-V characteristics have been measured. The diode exhibits a low Schottky barrier height of 0.45 eV and ideality factor of 2.93 at room temperature. The In2O3 nanotower gas sensors have excellent gas-sensing characteristics to hydrogen concentration ranging from 2 to 1000 ppm at operating temperature of 120-275 °C, such as high response (83 % at 240 °C to 1000 ppm H2), good selectivity (response to H2, CH4, C2H2, and C3H8), and small deviation from the ideal value of power exponent β (0.48578 at 240 °C). The sensors show fine long-term stability during exposure to 1000 ppm H2 under operating temperature of 240 °C in 30 days. Lots of oxygen vacancies and chemisorbed oxygen ions existing in the In2O3 nanotowers according to the x-ray photoelectron spectroscopy (XPS) results, the change of Schottky barrier height in the Cr/In2O3 Schottky junction, and the thermoelectronic emission due to the contact between two In2O3 nanotowers mainly contribute for the H2 sensing mechanism. The growth mechanism of the In2O3 nanotowers can be described to be the Vapor-Solid (VS) process.

  18. Identification a novel mononucleotide deletion mutation in GAA in pompe disease patients

    Directory of Open Access Journals (Sweden)

    Milad Ebrahimi

    2017-01-01

    Full Text Available Background: Mutations in the acid alpha-glucosidase (GAA gene usually lead to reduced GAA activity. In this study, we analyzed the mutations of GAA and GAA enzyme activity from one sibling suspected Pompe disease and their first-degree relatives. Materials and Methods: In this cross-sectional study, GAA enzyme activity assay was assessed using tandem mass spectrometry. Polymerase chain reaction and Sanger sequencing were performed for GAA analysis. Results: GAA enzyme activity was significantly decreased in patients compared to the normal range (P = 0.02. Two individuals showed ten alterations in the GAA sequence, in which one of them (c. 1650del G has not been previously described in the literature. A single Guanine deletion (del-G was detected at codon 551 in exon 12. Conclusion: According to the literature, the detected change is a novel mutation. We hypothesized that the discovered deletion in the GAA might lead to a reduced activity of the gene product.

  19. X-ray diffraction from single GaAs nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Biermanns, Andreas

    2012-11-12

    In recent years, developments in X-ray focussing optics have allowed to produce highly intense, coherent X-ray beams with spot sizes in the range of 100 nm and below. Together with the development of new experimental stations, X-ray diffraction techniques can now be applied to study single nanometer-sized objects. In the present work, X-ray diffraction is applied to study different aspects of the epitaxial growth of GaAs nanowires. Besides conventional diffraction methods, which employ X-ray beams with dimensions of several tens of {mu}m, special emphasis lies on the use of nanodiffraction methods which allow to study single nanowires in their as-grown state without further preparation. In particular, coherent X-ray diffraction is applied to measure simultaneously the 3-dimensional shape and lattice parameters of GaAs nanowires grown by metal-organic vapor phase epitaxy. It is observed that due to a high density of zinc-blende rotational twins within the nanowires, their lattice parameter deviates systematically from the bulk zinc-blende phase. In a second step, the initial stage in the growth of GaAs nanowires on Si (1 1 1) surfaces is studied. This nanowires, obtained by Ga-assisted growth in molecular beam epitaxy, grow predominantly in the cubic zinc-blende structure, but contain inclusions of the hexagonal wurtzite phase close to their bottom interface. Using nanodiffraction methods, the position of the different structural units along the growth axis is determined. Because the GaAs lattice is 4% larger than silicon, these nanowires release their lattice mismatch by the inclusion of dislocations at the interface. Whereas NWs with diameters below 50 nm are free of strain, a rough interface structure in nanowires with diameters above 100 nm prevents a complete plastic relaxation, leading to a residual strain at the interface that decays elastically along the growth direction. Finally, measurements on GaAs-core/InAs-shell nanowire heterostructures are presented

  20. Implanted Si atoms shifting between Ga sites and As sites by thermal stress in conductive-layer GaAs crystals on semi-insulating substrates

    Science.gov (United States)

    Saito, Yasuyuki

    1992-04-01

    Large (0.8 V order) discrepancies of threshold voltage Vth between the predicted Vth values by the Lindhard-Scharff-Schio/tt Gaussian approximate calculation and the Vth of the tungsten nitride (WNx) self-alignment (SA) gate GaAs metal-semiconductor field-effect transistors (MESFETs) were observed. These discrepancies were confirmed by the comparison of the Vth of the WNx-SA-gate MESFETs and the Vth of the (N+: high carrier concentration layers self-aligned of source-drain electrodes)-less conventional MESFETs on 2-in.-diam semi-insulating substrates from liquid-encapsulated-Czochralski-technique-grown boules. The discrepancy was also analyzed by the capacitance-voltage (C-V) measurement of large-diameter (440 μm) Schottky diodes which were built into the MESFET arrays. It was found that for obtained SA-process carrier depth profiles (Si, 150 keV, 3×1012 cm-2) the carrier concentration at a depth of 0.25 μm decreased from 5.3×1016 to 2.0×1016 cm-3, but, on the other hand, the peak carrier concentration slightly decreased from 12.8×1016 to 12.4×1016 cm-3. By the calculation for Vth on the basis of the actual C-V carrier depth profiles, it was found that the carrier concentration decrease was comparable to the Vth variation (0.8 V). Furthermore, the Vth variation of the shallow channel implantation (50 keV) was comparable to that of the deep channel implantation (150 keV). As a result of the experiment and analysis, it was found that the large Vth variation for the SA N+ process was caused by reoccupation (Ga sites to As sites) of implanted Si atoms in the channel active-layer crystal by tensile stress formed by the thermal-expansion coefficient difference between chemical-vapor deposition (CVD) phosphosilicate glass (or CVD SiO2) film and (100) GaAs substrate crystal. The Si atom reoccupation quantity was, for the first time, explained by the Si atom compensation ratio equation as a function of the bond length (Si-As and Si-Ga) variation, an equation which

  1. Gallium Arsenide solar cell radiation damage experiment

    Science.gov (United States)

    Maurer, R. H.; Kinnison, J. D.; Herbert, G. A.; Meulenberg, A.

    1991-01-01

    Gallium arsenide (GaAs) solar cells for space applications from three different manufactures were irradiated with 10 MeV protons or 1 MeV electrons. The electrical performance of the cells was measured at several fluence levels and compared. Silicon cells were included for reference and comparison. All the GaAs cell types performed similarly throughout the testing and showed a 36 to 56 percent power areal density advantage over the silicon cells. Thinner (8-mil versus 12-mil) GaAs cells provide a significant weight reduction. The use of germanium (Ge) substrates to improve mechanical integrity can be implemented with little impact on end of life performance in a radiation environment.

  2. Development of a lightweight, light-trapped, thin GaAs solar cell for spacecraft applications

    Science.gov (United States)

    Hannon, Margaret H.; Dinetta, Louis C.; Dashiell, Michael W.; Cummings, John R.; Barnett, Allen M.

    1994-01-01

    This paper describes ultra-lightweight, high performance, thin, light trapping GaAs solar cells for advanced space power systems. The device designs can achieve 24.5 percent efficiency at AMO and 1X conditions, corresponding to a power density of 330 W/m2. A significant breakthrough lies in the potential for a specific power of 2906 W/kg because the entire device is less than 1.5 microns thick. This represents a 440 percent improvement over conventional 4-mil silicon solar cells. In addition to being lightweight, this thin device design can result in increased radiation tolerance. The attachment of the cover glass support to the front surface has been demonstrated by both silicone and electrostatic bonding techniques. Device parameters of 1.002 volts open-circuit voltage, 80 percent fill factor, and a short-circuit current of 24.3 mA/sq cm have been obtained. This demonstrates a conversion efficiency of 14.4 percent resulting in a specific power of 2240 W/kg. Additionally, this new technology offers an alternative approach for enabling multi-bandgap solar cells and high output space solar power devices. The thin device structure can be applied to any 3-5 based solar cell application, yielding both an increase in specific power and radiation tolerance.

  3. Electrical properties of Au/perylene-monoimide/p-Si Schottky diode

    International Nuclear Information System (INIS)

    Yüksel, Ö.F.; Tuğluoğlu, N.; Gülveren, B.; Şafak, H.; Kuş, M.

    2013-01-01

    Graphical abstract: In this work, we have fabricated an Au/perylene-monoimide (PMI)/p-Si Schottky barrier diode. An emphasis is placed on how electrical and interface characteristics like current–voltage (I–V) variation, ideality factor (n), barrier height (Φ B ) and series resistance (R s ) of Au/PMI/p-Si diode structure change with the temperatures between 100 and 300 K. The temperature dependence of barrier height shows that the Schottky barrier height is inhomogeneous in nature at the interface. Such inhomogeneous behavior was explained on the basis of thermionic emission mechanism by assuming the existence of a Gaussian distribution of barrier heights. -- Highlights: •An Au/perylene-monoimide (PMI)/p-Si Schottky diode having an organic interlayer has been fabricated. •I–V characteristics have been investigated over a wide temperature range 100–300 K. •C–V measurements have been analyzed at room temperature. -- Abstract: In this work, we have fabricated an Au/perylene-monoimide (PMI)/p-Si Schottky barrier diode. We have investigated how electrical and interface characteristics like current–voltage characteristics (I–V), ideality factor (n), barrier height (Φ B ) and series resistance (R s ) of diode change with temperature over a wide range of 100–300 K. Detailed analysis on the electrical properties of structure is performed by assuming the standard thermionic emission (TE) model. Possible mechanisms such as image force lowering, generation–recombination processes and interface states which cause deviations of n values from the unity have been discussed. Cheung–Cheung method is also employed to analysis the current–voltage characteristics and a good agreement is observed between the results. It is shown that the electronic properties of Schottky diode are very sensitive to the modification of perylene-monoimide (PMI) interlayer organic material and also to the temperature. The ideality factor was found to decrease and the barrier

  4. Molecular beam epitaxy of GaAs nanowires and their sustainability for optoelectronic applications. Comparing Au- and self-assisted growth methods

    Energy Technology Data Exchange (ETDEWEB)

    Breuer, Steffen

    2011-09-28

    In this work the synthesis of GaAs nanowires by molecular beam epitaxy (MBE) using the vapour-liquid-solid (VLS) mechanism is investigated. A comparison between Au- and self-assisted VLS growth is at the centre of this thesis. While the Au-assisted method is established as a versatile tool for nanowire growth, the recently developed self-assisted variation results from the exchange of Au by Ga droplets and thus eliminates any possibility of Au incorporation. By both methods, we achieve nanowires with epitaxial alignment to the Si(111) substrates. Caused by differences during nanowire nucleation, a parasitic planar layer grows between the nanowires by the Au-assisted method, but can be avoided by the self-assisted method. Au-assisted nanowires grow predominantly in the metastable wurtzite crystal structure, while their self-assisted counterparts have the zincblende structure. All GaAs nanowires are fully relaxed and the strain arising from the lattice mismatch between GaAs and Si of 4.1 % is accommodated by misfit dislocations at the interface. Self-assisted GaAs nanowires are generally found to have vertical and non-polar side facets, while tilted and polar nanofacets were described for Au-assisted GaAs nanowires. We employ VLS nucleation theory to understand the effect of the droplet material on the lateral facets. Optoelectronic applications require long minority carrier lifetimes at room temperature. We fabricate GaAs/(Al,Ga)As core-shell nanowires and analyse them by transient photoluminescence (PL) spectroscopy. The results are 2.5 ns for the self-assisted nanowires as well as 9 ps for the Au-assisted nanowires. By temperature-dependent PL measurements we find a characteristic activation energy of 77 meV that is present only in the Au-assisted nanowires. We conclude that most likely Au is incorporated from the droplets into the GaAs nanowires and acts as a deep, non-radiative recombination centre.

  5. Out-of-plane strain and electric field tunable electronic properties and Schottky contact of graphene/antimonene heterostructure

    Science.gov (United States)

    Phuc, Huynh V.; Hieu, Nguyen N.; Hoi, Bui D.; Phuong, Le T. T.; Hieu, Nguyen V.; Nguyen, Chuong V.

    2017-12-01

    In this paper, the electronic properties of graphene/monolayer antimonene (G/m-Sb) heterostructure have been studied using the density functional theory (DFT). The effects of out-of-plane strain (interlayer coupling) and electric field on the electronic properties and Schottky contact of the G/m-Sb heterostructure are also investigated. The results show that graphene is bound to m-Sb layer by a weak van-der-Waals interaction with the interlayer distance of 3.50 Å and the binding energy per carbon atom of -39.62 meV. We find that the n-type Schottky contact is formed at the G/m-Sb heterostructure with the Schottky barrier height (SBH) of 0.60 eV. By varying the interlayer distance between graphene and the m-Sb layer we can change the n-type and p-type SBH at the G/m-Sb heterostructure. Especially, we find the transformation from n-type to p-type Schottky contact with decreasing the interlayer distance. Furthermore, the SBH and the Schottky contact could be controlled by applying the perpendicular electric field. With the positive electric field, electrons can easily transfer from m-Sb to graphene layer, leading to the transition from n-type to p-type Schottky contact.

  6. Variations in first principles calculated defect energies in GaAs and ...

    Indian Academy of Sciences (India)

    In particular, we have compared a large set of computed energies and selected the most appropriate values. Then, in the context of GaAs material quality, we investigated the impact of errors in calculation of formation energies on the performance of the GaAs substrate for device fabrication. We find that in spite of the errors ...

  7. Thin-film GaAs epitaxial life-off solar cells for space applications

    NARCIS (Netherlands)

    Schermer, J.J.; Mulder, P.; Bauhuis, G.J.; Larsen, P.K.; Oomen, G.; Bongers, E.

    2005-01-01

    In the present work the space compatibility of thin-film GaAs solar cells is studied. These cells are separated from their GaAs substrate by the epitaxial lift-off (ELO) technique and mounted behind a CMG cover glass which at the same time serves as a stable carrier for the thin film cells. In the

  8. Structure and homoepitaxial growth of GaAs(6 3 1)

    International Nuclear Information System (INIS)

    Mendez-Garcia, V.H.; Ramirez-Arenas, F.J.; Lastras-Martinez, A.; Cruz-Hernandez, E.; Pulzara-Mora, A.; Rojas-Ramirez, J.S.; Lopez-Lopez, M.

    2006-01-01

    We have studied the surface atomic structure of GaAs(6 3 1), and the GaAs growth by molecular beam epitaxy (MBE) on this plane. After the oxide desorption process at 585 deg. Creflection high-energy electron diffraction (RHEED) showed along the [-1 2 0] direction a 2x surface reconstruction for GaAs(6 3 1)A, and a 1x pattern was observed for GaAs(6 3 1)B. By annealing the substrates for 60 min, we observed that on the A surface appeared small hilly-like features, while on GaAs(6 3 1)B surface pits were formed. For GaAs(6 3 1)A, 500 nm-thick GaAs layers were grown at 585 deg. C. The atomic force microscopy (AFM) images at the end of growth showed the self-formation of nanoscale structures with a pyramidal shape enlarged along the [5-9-3] direction. Transversal views of the bulk-truncated GaAs(6 3 1) surface model showed arrays of atomic grooves along this direction, which could influence the formation of the pyramidal structures

  9. Wavelength dependent laser-induced etching of Cr–O doped GaAs ...

    Indian Academy of Sciences (India)

    Administrator

    The laser induced etching of semi-insulating GaAs 〈100〉 is carried out to create porous structure ... Keywords. Laser-induced etching; intermediate state; nanostructure; SEM; AFM. 1. Introduction. Laser-induced etching, an improved etching process, is very ... into the properties and applications of GaAs, the surface.

  10. Amateurism in an Age of Professionalism: An Empirical Examination of an Irish Sporting Culture: The GAA

    Directory of Open Access Journals (Sweden)

    Ian Keeler

    2013-07-01

    This research study recommends that the GAA adopt an innovative approach, through strategic decision-making, to allow the GAA to maintain its amateur ethos, and, yet, successfully compete in the professional sporting market. The strong links with the community must be both nurtured and enhanced. The GAA and Gaelic games must embrace the challenges that the branding success of foreign sports has brought. Player welfare issues for the elite players must be addressed while continuing to protect the club and its amateur structures. The study looks at the key metrics that are required to evolve the GAA. This entails not only focusing on the perceived importance of the amateur ethos to the GAA, but also developing the marketing, branding and profiling of Gaelic games to enhance the performance of an amateur sporting organization in an era of increased professionalism in sport.

  11. Understanding and Curing Structural Defects in Colloidal GaAs Nanocrystals

    Energy Technology Data Exchange (ETDEWEB)

    Srivastava, Vishwas [Department of Chemistry; Liu, Wenyong [Department of Chemistry; Janke, Eric M. [Department of Chemistry; Kamysbayev, Vladislav [Department of Chemistry; Filatov, Alexander S. [Department of Chemistry; Sun, Cheng-Jun [Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States; Lee, Byeongdu [Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States; Rajh, Tijana [Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States; Schaller, Richard D. [Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States; Department of; Talapin, Dmitri V. [Department of Chemistry; Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States

    2017-02-22

    Nearly three decades since the first report on the synthesis of colloidal GaAs nanocrystals (NCs), the preparation and properties of this material remain highly controversial. Traditional synthetic routes either fail to produce the GaAs phase or result in materials that do not show expected optical properties such as excitonic transitions. In this work, we demonstrate a variety of synthetic routes toward crystalline GaAs NCs. By using a combination of Raman, EXAFS and transient absorption spectroscopies, we conclude that unusual optical properties of 2 colloidal GaAs NCs can be related to the presence of vacancies and lattice disorder. We introduce novel molten salt based annealing approach to alleviate these structural defects and show the emergence of size-dependent excitonic transitions in colloidal GaAs quantum dots.

  12. Magnetophotoluminescence in high purity MOVPE GaAs

    Science.gov (United States)

    Zemon, S. A.; Norris, P. E.; Lambert, G.

    1986-09-01

    Magnetophotoluminescence (MPL) is shown to be useful for the identification of trace acceptor impurities in MOVPE GaAs. Using MPL a trace concentration of zinc acceptors was detected in a sample where the zinc transitions were obscured in zero magnetic field. Acceptor MPL was observed to be insensitive to V/III ratio for values between 17.3 and 54.4. Conduction-band-to-acceptor MPL spectral widths as small as 0.3 meV were found. Resolved Landau level transitions and the magnetic splitting of conduction-band-to-acceptor transitions were observed.

  13. Spin noise spectroscopy on donors in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Bernien, Hannes; Mueller, Georg; Roemer, Michael; Huebner, Jens; Oestreich, Michael [Institute for Solid State Physics, Gottfried Wilhelm Leibniz University Hannover (Germany)

    2009-07-01

    In recent experiments spin noise spectroscopy (SNS) has proven to be a very sensitive technique to study electron spin dynamics in semiconductors at thermal equilibrium. Here we present SNS-measurements on donor bound electrons in very low doped bulk GaAs. In this environment the donors do not interact with each other and form artificial atoms. We discuss the detection of single donor bound electron spins, which should have extremely long spin relaxation times compared to ensemble spin relaxation times. In further experiments the electron bound to the donor will be used to probe and study the local nuclear magnetic field at the donor site.

  14. GaAs vapor-grown bipolar transistors.

    Science.gov (United States)

    Nuese, C. J.; Gannon, J. J.; Dean, R. H.; Gossenberger, H. F.; Enstrom, R. E.

    1972-01-01

    Discussion of an approach for the fabrication of high-temperature GaAs transistors which is centered on the preparation of n-p-n three-layered structures entirely by a vapor-phase growth technique, as described by Tietjen and Amick (1966). The low growth temperature of approximately 750 C is thought to reduce contamination during crystal growth and to contribute to the reasonably high minority-carrier lifetimes obtained for the vapor-grown p-n junctions. The fact that impurity concentrations and layer thicknesses can be precisely controlled for epitaxial layers as thin as 1 micrometer is an important feature of this growth technique.

  15. Study of irradiation defects in GaAs

    International Nuclear Information System (INIS)

    Loualiche, S.

    1982-11-01

    Characterization techniques: C(V) differential capacity, DLTS deep level transient spectroscopy, DDLTS double deep level transient spectroscopy and DLOS deep level optical spectroscopy are studied and theoretical and experimental fundamentals are re-examined. In particular the centres created by ionic or electronic bombardment of p-type GaAs. New quantitative theoretical bases for the C(V) method are obtained. Study of the optical properties of traps due to irradiation using DLOS. The nature of irradiation defects are discussed [fr

  16. Simple intrinsic defects in GaAs : numerical supplement.

    Energy Technology Data Exchange (ETDEWEB)

    Schultz, Peter Andrew

    2012-04-01

    This Report presents numerical tables summarizing properties of intrinsic defects in gallium arsenide, GaAs, as computed by density functional theory. This Report serves as a numerical supplement to the results published in: P.A. Schultz and O.A. von Lilienfeld, 'Simple intrinsic defects in GaAs', Modelling Simul. Mater. Sci Eng., Vol. 17, 084007 (2009), and intended for use as reference tables for a defect physics package in device models. The numerical results for density functional theory calculations of properties of simple intrinsic defects in gallium arsenide are presented.

  17. Laser-induced bandgap collapse in GaAs

    Science.gov (United States)

    Siegal, Y.; Glezer, Eli N.; Huang, Li; Mazur, Eric

    1994-05-01

    We present recent time-resolved measurements of the linear dielectric constant of GaAs at 2.2 eV and 4.4 eV following femtosecond laser pulse excitation. In sharp contrast to predictions based on the widely used Drude model, the data show an interband absorption peak coming into resonance first with the 4.4 eV probe photon energy and then with the 2.2 eV probe photon energy, indicating major changes in the band structure. The time scale for these changes ranges from within 100 fs to a few picoseconds, depending on the incident pump pulse fluence.

  18. Advanced On-Board Signal Procesor GaAs Memory.

    Science.gov (United States)

    1983-11-01

    forgetting voltage was VW =2.4-2.5 V. One important parameter Influencing memory cycle times is the minimum pulse width that can write or change the...MRDC41083-29FTR-7 Copy No. 25 0 4 ADVANCED ON-BOARD SIGNAL k) PROCESSOR GaAs MEMORY , FINAL TECHNICAL REPORT FOR THE PERIOD January 21, 1981 through...on the design and fabrication of a 256 bit static memory chip. The development of operational 256 bit memory arrays has been used on three mask sets

  19. Model and observations of Schottky-noise suppression in a cold heavy-ion beam.

    Science.gov (United States)

    Danared, H; Källberg, A; Rensfelt, K-G; Simonsson, A

    2002-04-29

    Some years ago it was found at GSI in Darmstadt that the momentum spread of electron-cooled beams of highly charged ions dropped abruptly to very low values when the particle number decreased to 10 000 or less. This has been interpreted as an ordering of the ions, such that they line up after one another in the ring. We report observations of similar transitions at CRYRING, including an accompanying drop in Schottky-noise power. We also introduce a model of the ordered beam from which the Schottky-noise power can be calculated numerically. The good agreement between the model calculation and the experimental data is seen as evidence for a spatial ordering of the ions.

  20. High performance and transparent multilayer MoS2 transistors: Tuning Schottky barrier characteristics

    Directory of Open Access Journals (Sweden)

    Young Ki Hong

    2016-05-01

    Full Text Available Various strategies and mechanisms have been suggested for investigating a Schottky contact behavior in molybdenum disulfide (MoS2 thin-film transistor (TFT, which are still in much debate and controversy. As one of promising breakthrough for transparent electronics with a high device performance, we have realized MoS2 TFTs with source/drain electrodes consisting of transparent bi-layers of a conducting oxide over a thin film of low work function metal. Intercalation of a low work function metal layer, such as aluminum, between MoS2 and transparent source/drain electrodes makes it possible to optimize the Schottky contact characteristics, resulting in about 24-fold and 3 orders of magnitude enhancement of the field-effect mobility and on-off current ratio, respectively, as well as transmittance of 87.4 % in the visible wavelength range.

  1. Fabrication of polymer Schottky diode with Al-PANI/MWCNT-Au structure

    Directory of Open Access Journals (Sweden)

    A Hajibadali

    2014-11-01

    Full Text Available In this research, Schottky diode with Al-PANI/MWCNT-Au structure was fabricated using spin coating of composite polymer and physical vapor deposition of metals. For this purpose, a thin layer of gold was coated on glass and then composite of polyaniline/multi-walled carbon nanotube was synthesized and spin-coated on gold layer. Finally, a thin layer of aluminum was coated on polymer layer. The current-voltage characteristics of diode were studied and found that I-V curve is nonlinear and nonsymmetrical, showing rectifying behavior. I-V characteristics plotted on a logarithmic scale for Schottky diode showed two distinct power law regions. At lower voltages, the mechanism follows Ohm’s Law and at higher voltages, the mechanism is consistent with space charge limited conduction (SCLC emission. The parameters extracted from I-V characteristics were also calculated.

  2. Charge transport mechanisms of graphene/semiconductor Schottky barriers: A theoretical and experimental study

    International Nuclear Information System (INIS)

    Zhong, Haijian; Liu, Zhenghui; Xu, Gengzhao; Shi, Lin; Fan, Yingmin; Yang, Hui; Xu, Ke; Wang, Jianfeng; Ren, Guoqiang

    2014-01-01

    Graphene has been proposed as a material for semiconductor electronic and optoelectronic devices. Understanding the charge transport mechanisms of graphene/semiconductor Schottky barriers will be crucial for future applications. Here, we report a theoretical model to describe the transport mechanisms at the interface of graphene and semiconductors based on conventional semiconductor Schottky theory and a floating Fermi level of graphene. The contact barrier heights can be estimated through this model and be close to the values obtained from the experiments, which are lower than those of the metal/semiconductor contacts. A detailed analysis reveals that the barrier heights are as the function of the interface separations and dielectric constants, and are influenced by the interfacial states of semiconductors. Our calculations show how this behavior of lowering barrier heights arises from the Fermi level shift of graphene induced by the charge transfer owing to the unique linear electronic structure

  3. Charge transport mechanisms of graphene/semiconductor Schottky barriers: A theoretical and experimental study

    Energy Technology Data Exchange (ETDEWEB)

    Zhong, Haijian; Liu, Zhenghui; Xu, Gengzhao; Shi, Lin; Fan, Yingmin; Yang, Hui [Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123 (China); Xu, Ke, E-mail: kxu2006@sinano.ac.cn; Wang, Jianfeng; Ren, Guoqiang [Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, Suzhou 215123 (China); Suzhou Nanowin Science and Technology Co., Ltd., Suzhou 215123 (China)

    2014-01-07

    Graphene has been proposed as a material for semiconductor electronic and optoelectronic devices. Understanding the charge transport mechanisms of graphene/semiconductor Schottky barriers will be crucial for future applications. Here, we report a theoretical model to describe the transport mechanisms at the interface of graphene and semiconductors based on conventional semiconductor Schottky theory and a floating Fermi level of graphene. The contact barrier heights can be estimated through this model and be close to the values obtained from the experiments, which are lower than those of the metal/semiconductor contacts. A detailed analysis reveals that the barrier heights are as the function of the interface separations and dielectric constants, and are influenced by the interfacial states of semiconductors. Our calculations show how this behavior of lowering barrier heights arises from the Fermi level shift of graphene induced by the charge transfer owing to the unique linear electronic structure.

  4. Fabrication of 4H-SiC Schottky barrier diodes with high breakdown voltages

    CERN Document Server

    Kum, B H; Shin, M W; Park, J D

    1999-01-01

    This paper discusses the fabrication and the breakdown characteristics of 4H-SiC Schottky barrier diodes (SBDs). Optimal processing conditions for the ohmic contacts were extracted using the transmission-line method (TLM) and were applied to the device fabrication. The Ti/4H-SiC SBDs with Si sub x B sub y passivation showed a maximum reverse breakdown voltage of 268 V with a forward current density as high as 70 mA/cm sup 2 at a forward voltage of 2 V. The breakdown of the Pt. 4H-SiC SBDs without any passivation occurred at near 110 V. It is concluded that the breakdown enhancement in the Ti/4H-SiC SBDs can be attributed to the passivation; otherwise, excess surface charge near the edge of the Schottky contact would lead to electric fields of sufficient magnitude to cause field emission.

  5. Operation and scalability of dopant-segregated Schottky barrier MOSFETs with recessed channels

    International Nuclear Information System (INIS)

    Shih, Chun-Hsing; Hsia, Jui-Kai

    2013-01-01

    Recessed channels were used in scaled dopant-segregated Schottky barrier MOSFETs (DS-SBMOS) to control the severe short-channel effect. The physical operation and device scalability of the DS-SBMOS resulting from the presence of recessed channels and associated gate-corners are elucidated. The coupling of Schottky and gate-corner barriers has a key function in determining the on–off switching and drain current. The gate-corner barriers divide the channel into three regions for protection from the drain penetration field. To prevent resistive degradations in the drive current, an alternative asymmetric recessed channel (ARC) without a source-side gate-corner is proposed to simultaneously optimize both the short-channel effect and drive current in the scaled DS-SBMOS. By employing the proposed ARC architecture, the DS-SBMOS devices can be successfully scaled down, making them promising candidates for next-generation CMOS devices. (paper)

  6. Ab-initio study of NiGe/Ge Schottky contact

    Science.gov (United States)

    Vaidya, Dhirendra; Lodha, Saurabh; Ganguly, Swaroop

    2017-04-01

    Germanium is a promising material for next-generation electronic and photonic devices, and engineering ohmic contacts to it can be expected to be a key challenge therein. The sensitivity of the Schottky barrier height of the NiGe/Ge contact to the detailed interfacial structure is revealed using the ab-initio study of pseudo-epitaxial NiGe(001)/Ge(100) contact using the computationally efficient meta-generalized-gradient-approximation, which can overcome the well-known bandgap underestimation problem. The p-type Schottky barrier height for an atomically flat pseudo-epitaxial NiGe(001)/Ge(100) contact is calculated to be 260 meV, an overestimate of about 160 meV compared to experiments. However, the estimated modulation of this barrier height, by about 270 meV, due to interface morphology points to a possible explanation for this discrepancy and suggests ways to engineer the contact for lesser resistivity.

  7. On-Chip Power-Combining for High-Power Schottky Diode-Based Frequency Multipliers

    Science.gov (United States)

    Chattopadhyay, Goutam; Mehdi, Imran; Schlecht, Erich T.; Lee, Choonsup; Siles, Jose V.; Maestrini, Alain E.; Thomas, Bertrand; Jung, Cecile D.

    2013-01-01

    A 1.6-THz power-combined Schottky frequency tripler was designed to handle approximately 30 mW input power. The design of Schottky-based triplers at this frequency range is mainly constrained by the shrinkage of the waveguide dimensions with frequency and the minimum diode mesa sizes, which limits the maximum number of diodes that can be placed on the chip to no more than two. Hence, multiple-chip power-combined schemes become necessary to increase the power-handling capabilities of high-frequency multipliers. The design presented here overcomes difficulties by performing the power-combining directly on-chip. Four E-probes are located at a single input waveguide in order to equally pump four multiplying structures (featuring two diodes each). The produced output power is then recombined at the output using the same concept.

  8. Screening charge localization at LiNbO{sub 3} surface with Schottky junction

    Energy Technology Data Exchange (ETDEWEB)

    Nagata, Takahiro, E-mail: NAGATA.Takahiro@nims.go.jp; Chikyow, Toyohiro [International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan); Kitamura, Kenji [Environment and Energy Materials Division, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)

    2016-04-25

    Screening charge localization was demonstrated by using a Schottky contact with LiNbO{sub 3} (LN). A Cr/LN stack structure with a 2 μm diameter hole array penetrating the Cr layer localized the screening charge of LN in the hole, although the Al/LN stack structure exhibited no surface charge localization behavior. X-ray photoelectron spectroscopy revealed that Cr formed a Schottky contact with LN, which prevents the screening charge from escaping from the hole arrays. The screening charge localization was enhanced by inserting SiO{sub 2} between the metal and LN, which moved the position of the Fermi level to mid gap.

  9. Film thickness degradation of Au/GaN Schottky contact characteristics

    International Nuclear Information System (INIS)

    Wang, K.; Wang, R.X.; Fung, S.; Beling, C.D.; Chen, X.D.; Huang, Y.; Li, S.; Xu, S.J.; Gong, M.

    2005-01-01

    Electrical characteristics of Au/n-GaN Schottky contacts with different Au film thicknesses up to 1300 A, have been investigated using current-voltage (I-V) and capacitance-voltage (C-V) techniques. Results show a steady decrease in the quality of the Schottky diodes for increasing Au film thickness. I-V measurements indicate that thin ( 500 A). Depth profiling Auger electron spectroscopy (AES) shows that the width of the Au/GaN junction interface increases with increasing Au thickness, suggesting considerable inter-mixing of Au, Ga and N. The results have been interpreted in terms of Ga out-diffusion from the GaN giving rise to gallium vacancies that in turn act as sites for electron-hole pair generation within the depletion region. The study supports the recent suggestion that gallium vacancies associated with threaded dislocations are playing an important role in junction breakdown

  10. Enhanced Schottky signals from electron-cooled, coasting beams in a heavy-ion storage ring

    Energy Technology Data Exchange (ETDEWEB)

    Krantz, C., E-mail: claude.krantz@mpi-hd.mpg.d [Max-Planck-Institut fuer Kernphysik, Saupfercheckweg 1, D-69117 Heidelberg (Germany); Blaum, K.; Grieser, M. [Max-Planck-Institut fuer Kernphysik, Saupfercheckweg 1, D-69117 Heidelberg (Germany); Litvinov, Yu.A. [Max-Planck-Institut fuer Kernphysik, Saupfercheckweg 1, D-69117 Heidelberg (Germany); GSI Helmholtzzentrum fuer Schwerionenforschung, Planckstrasse 1, D-64291 Darmstadt (Germany); Repnow, R.; Wolf, A. [Max-Planck-Institut fuer Kernphysik, Saupfercheckweg 1, D-69117 Heidelberg (Germany)

    2011-02-11

    Measurements at the Test Storage Ring of the Max-Planck-Institut fuer Kernphysik in Heidelberg (Germany) have shown that the signal amplitude induced in a Schottky-noise pickup electrode by a coasting electron-cooled ion beam can be greatly enhanced by exposure of the latter to a perturbing radiofrequency signal which is detuned from the true beam revolution frequency. The centre frequencies obtained from harmonic analysis of the observed pickup signal closely follow those imposed on the ions by the electron cooling force. The phenomenon can be exploited to measure the true revolution frequency of ion beams of very low intensity, whose pure Schottky noise is too weak to be measurable under normal circumstances.

  11. ZnO nanowire photodetectors based on Schottky contact with surface passivation

    Science.gov (United States)

    Zhang, Dakuan; Sheng, Yun; Wang, Jianyu; Gao, Fan; Yan, Shancheng; Wang, Junzhuan; Pan, Lijia; Wan, Qing; Shi, Yi

    2017-07-01

    Performance characteristics, such as dark current and response time, of ZnO nanowire (NW) photodetectors are usually degraded by H2O/O2 adsorption on the NW surfaces. In this work, ZnO NW photodetectors based on Au Schottky contact through passivating surface states were investigated. ZnO NW photodetectors were fabricated with a lateral electrode structure, in which Au served as Au/ZnO Schottky contact and semi-transparent top electrode. Specifically, passivation of the surface states of ZnO NWs by using highly intensive UV irradiation effectively improved the photoresponse. A physical model based on surface band theory was developed to understand the origin of the performance improvement of the photodetector. The present device architecture prevents ZnO NWs photodetector from H2O/O2 adsorption in air and efficiently extracts photogenerated carriers across a diametrical direction.

  12. Understanding Mott-Schottky Measurements under Illumination in Organic Bulk Heterojunction Solar Cells

    Science.gov (United States)

    Zonno, Irene; Martinez-Otero, Alberto; Hebig, Jan-Christoph; Kirchartz, Thomas

    2017-03-01

    The Mott-Schottky analysis in the dark is a frequently used method to determine the doping concentration of semiconductors from capacitance-voltage measurements, even for such complex systems as polymer:fullerene blends used for organic solar cells. While the analysis of capacitance-voltage measurements in the dark is relatively well established, the analysis of data taken under illumination is currently not fully understood. Here, we present experiments and simulations to show which physical mechanisms affect the Mott-Schottky analysis under illumination. We show that the mobility of the blend has a major influence on the shape of the capacitance-voltage curve and can be obtained from data taken under reverse bias. In addition, we show that the apparent shift of the built-in voltage observed previously can be explained by a shift of the onset of space-charge-limited collection with illumination intensity.

  13. High Level Software for 4.8 Ghz LHC Schottky System

    CERN Document Server

    Cai, J; Pasquinelli, R J; Favier, M; Jones, O R; Jansson, A; Lahey, T E

    2011-01-01

    A high level software package has been developed for a 4.8GHz Schottky system installed in the LHC at CERN. It has two main components. The first is a monitor application continuously running on a dedicated server as a daemon process to acquire the FFT traces, perform data analysis, publish results and do archiving. The second is a graphical user interface to display the FFT traces and various measurement results. It also allows the end user to change the settings for the front-end electronics such as the local oscillators, bunch selector, amplifier gains etc. Data analysis with curve fitting poses a big challenge due to the strong coherent signals that are often observed superimposed onto the Schottky sidebands. A method has been successfully created to remove the coherent spikes to enable curve fitting on the underlying signals, with the ultimate aim of providing reliable tune, momentum spread, chromaticity and emittance measurements for LHC beams with no external excitation.

  14. The effects of temperature on Schottky diode barrier height and evidence of multiple barrier

    International Nuclear Information System (INIS)

    Rabah, K.V.O.

    1994-07-01

    Experimental study of Capacitance-Voltage-Temperature (C-V-T) plots, Current-Voltage-Temperature (I-V-T) characteristics have been undertaken in order to determine the height of the Schottky barrier. The results of the barrier height obtained by the above two methods were found to differ as well as vary with temperature change. In view of this discrepancy in barrier height values, two further experiments were performed: one on activation energy (I-T) plots and the other on pulsed (I-V-T) characteristics, and the results were found to show a similar trend. The Schottky diode studied was a 30CP040. (author). 23 refs, 9 figs, 3 tabs

  15. Tunable Schottky contacts in the antimonene/graphene van der Waals heterostructures

    Science.gov (United States)

    Li, Wei; Wang, Xinlian; Dai, Xianqi

    2017-03-01

    Electronic structures modulation in the antimonene/graphene van der Waals(vdW) heterostructure with an external electric field(Eext) are investigated by density functional theory calculations. It is demonstrated that weak vdW interactions dominate between antimonene and graphene with their intrinsic electronic properties preserved. Furthermore, the vertical Eext can control not only the Schottky barrier but also the Schottky contacts (n-type and p-type) and Ohmic contacts (n-type) at the antimonene/graphene interface. Meanwhile, the negative Eext can shifts the Dirac point of graphene above the Fermi level, resulting in p-type doping in graphene because electrons can easily transfer from the Dirac point of graphene to the conduction band of antimonene. The present study would open a new avenue for application of ultrathin antimonene/graphene heterostructures in future nano- and optoelectronics.

  16. ALD TiO2 thin film as dielectric for Al/p-Si Schottky diode

    Indian Academy of Sciences (India)

    3.2 Capacitance–voltage (C–V) and conductance– voltage (G/w–V) characteristics. Variations of C–V and G/w–V measurements for Al/TiO2/ p-Si Schottky diode were performed at different frequencies. (50–500 kHz). As can be seen in figure 5(a) and (b), the values of the capacitance and conductance at negative volt-.

  17. A Schottky receiver for non-perturbative tune monitoring in the Tevatron

    International Nuclear Information System (INIS)

    Martin, D.; Cliff, P.; Fellenz, B.; Horton, B.; Jackson, G.; McConnell, D.; Shafer, R.; Siemann, R.

    1989-03-01

    Transverse Schottky noise and coherent betatron modulation of the bunched beam revolution harmonics are continuously monitored by a sensitive receiver. The electronics relies upon low noise amplifiers, narrow-band filters, and spectrally pure oscillators to obtain a minimum detectable signal of -160 dBm. Dynamic range is 80 dB. Separate baseband proton and antiproton signals are continuously analyzed in the Main Control Room

  18. Abelian solutions of the soliton equations and Riemann-Schottky problems

    Science.gov (United States)

    Krichever, Igor M.

    2008-12-01

    The present article is an exposition of the author's talk at the conference dedicated to the 70th birthday of S.P. Novikov. The talk contained the proof of Welters' conjecture which proposes a solution of the classical Riemann-Schottky problem of characterizing the Jacobians of smooth algebraic curves in terms of the existence of a trisecant of the associated Kummer variety, and a solution of another classical problem of algebraic geometry, that of characterizing the Prym varieties of unramified covers.

  19. Spectrally dependent photovoltages in Schottky photodiode based on (100) B-doped diamond

    Czech Academy of Sciences Publication Activity Database

    Čermák, Jan; Koide, Y.; Takeuchi, D.; Rezek, Bohuslav

    2014-01-01

    Roč. 115, č. 5 (2014), "053105-1"-"053105-6" ISSN 0021-8979 R&D Projects: GA ČR(CZ) GBP108/12/G108 Grant - others:AVČR(CZ) M100101209 Institutional support: RVO:68378271 Keywords : Schottky barrier * diamond * Kelvin probe force microscopy * surface photovoltage Subject RIV: BH - Optics, Masers, Lasers Impact factor: 2.183, year: 2014

  20. Tunable Schottky diodes fabricated from crossed electrospun SnO{sub 2}/PEDOT-PSSA nanoribbons

    Energy Technology Data Exchange (ETDEWEB)

    Carrasquillo, Katherine V. [Department of Physics and Electronics, University of Puerto Rico-Humacao, Humacao, PR 00792 (Puerto Rico); Pinto, Nicholas J., E-mail: nicholas.pinto@upr.edu [Department of Physics and Electronics, University of Puerto Rico-Humacao, Humacao, PR 00792 (Puerto Rico)

    2012-06-25

    Graphical abstract: Crossed SnO{sub 2}/PEDOT-PSSA nanoribbon Schottky diodes. Highlight: Black-Right-Pointing-Pointer An inexpensive electrospinning technique is used to fabricate crossed nanoribbons of n-doped tin oxide and p-PEDOT. Black-Right-Pointing-Pointer Each intersection is a localized Schottky diode that is completely exposed to the environment after electrodes deposition. Black-Right-Pointing-Pointer This makes it useful as a gas and light sensor. Black-Right-Pointing-Pointer In addition, the ability to tune the diode parameters via a back gate truly makes this device multifunctional. Black-Right-Pointing-Pointer A half wave rectifier has been demonstrated with this device under UV illumination. - Abstract: Schottky diodes have been fabricated on doped Si/SiO{sub 2} substrates in air, by simply crossing individual electrospun tin oxide (SnO{sub 2}) and poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSSA) nanoribbons. The conductivity of PEDOT-PSSA was {approx}6 S/cm with no observable field effect, while SnO{sub 2} exhibited n-doped field effect behavior with a charge mobility of {approx}3.1 cm{sup 2}/V-s. The diodes operate in air or in vacuum, under ambient illumination or in the dark, with low turn-on voltages and device parameters that are tunable via a back gate bias or a UV light source. Their unique design involves a highly localized active region that is completely exposed to the surrounding environment, making them potentially attractive for use as sensors. The standard thermionic emission model of a Schottky junction was applied to analyze the forward bias diode characteristics and was successfully tested as a half wave rectifier.

  1. Theory of photoexcited and thermionic emission across a two-dimensional graphene-semiconductor Schottky junction

    OpenAIRE

    Trushin, Maxim

    2017-01-01

    We find that intrinsic graphene provides efficient photocarrier transport across a two-dimensional graphene-semiconductor Schottky junction as a linear response to monochromatic light with excitation energy well below the semiconductor bandgap. The operation mechanism relies both on zero-bias photoexcited and thermionic emission contributing to photoresponsivity, enabled by the extended photocarrier thermalization time in intrinsic graphene. The photoresponsivity rapidly increases with excita...

  2. Selective WSi2 Schottky diodes made by rapid thermal chemical vapor deposition of WCl6

    Science.gov (United States)

    Trincat, F.; Regolini, J. L.; Mercier, J.; Bensahel, D.

    1991-12-01

    Selective WSi2/Si Schottky diodes, with an ideality factor of 1.02, are obtained by limited reaction processing chemical vapor deposition at 800 °C, using WCl6 vapor diluted in H2. The deposition temperature is shown to be the most important parameter for defect formation. The diodes were fabricated on patterned and blanket wafers, and no additional thermal treatment is needed to obtain the final diode characteristics.

  3. Schottky-Gated Probe-Free ZnO Nanowire Biosensor

    KAUST Repository

    Yeh, Ping-Hung

    2009-12-28

    (Figure Presented) A nanowire-based nanosensor for detecting biologically and chemically charged molecules that is probe-free and highly sensitive is demonstrated. The device relies on the nonsymmetrical Schottky contact under reverse bias (see figure) and is much more sensitive than the device based on the symmetric ohmic contact. This approach serves as a guideline for designing more practical chemical and biochemical sensors. © 2009 WILEY-VCH Verlag GmbH & Co. KGaA.

  4. Vertically grown Ge nanowire Schottky diodes on Si and Ge substrates

    Science.gov (United States)

    Chandra, Nishant; Tracy, Clarence J.; Cho, Jeong-Hyun; Picraux, S. T.; Hathwar, Raghuraj; Goodnick, Stephen M.

    2015-07-01

    The processing and performance of Schottky diodes formed from arrays of vertical Ge nanowires (NWs) grown on Ge and Si substrates are reported. The goal of this work is to investigate CMOS compatible processes for integrating NWs as components of vertically scaled integrated circuits, and elucidate transport in vertical Schottky NWs. Vertical phosphorus (P) doped Ge NWs were grown using vapor-liquid-solid epitaxy, and nickel (Ni)-Ge Schottky contacts were made to the tops of the NWs. Current-voltage (I-V) characteristics were measured for variable ranges of NW diameters and numbers of nanowires in the arrays, and the I-V characteristics were fit using modified thermionic emission theory to extract the barrier height and ideality factor. As grown NWs did not show rectifying behavior due to the presence of heavy P side-wall doping during growth, resulting in a tunnel contact. After sidewall etching using a dilute peroxide solution, rectifying behavior was obtained. Schottky barrier heights of 0.3-0.4 V and ideality factors close to 2 were extracted using thermionic emission theory, although the model does not give an accurate fit across the whole bias range. Attempts to account for enhanced side-wall conduction due to non-uniform P doping profile during growth through a simple shunt resistance improve the fit, but are still insufficient to provide a good fit. Full three-dimensional numerical modeling using Silvaco Atlas indicates that at least part of this effect is due to the presence of fixed charge and acceptor like traps on the NW surface, which leads to effectively high ideality factors.

  5. ALD TiO2 thin film as dielectric for Al/p-Si Schottky diode

    Indian Academy of Sciences (India)

    sis, sensors, antireflection coating, solar cells and Schottky diodes (Kadoshima et al 2003; Pakma .... the applied-bias voltage (V ≥ 3kT/q) and the current according to thermionic emission (TE) theory is given by (Sze 1981; Rhoderick and Williams 1988; Güllü et al 2012; Reddy and Reddy 2012). I = Io exp. ( q(V − IRs). nkT. )[.

  6. Tunable Schottky diodes fabricated from crossed electrospun SnO2/PEDOT-PSSA nanoribbons

    International Nuclear Information System (INIS)

    Carrasquillo, Katherine V.; Pinto, Nicholas J.

    2012-01-01

    Graphical abstract: Crossed SnO 2 /PEDOT-PSSA nanoribbon Schottky diodes. Highlight: ► An inexpensive electrospinning technique is used to fabricate crossed nanoribbons of n-doped tin oxide and p-PEDOT. ► Each intersection is a localized Schottky diode that is completely exposed to the environment after electrodes deposition. ► This makes it useful as a gas and light sensor. ► In addition, the ability to tune the diode parameters via a back gate truly makes this device multifunctional. ► A half wave rectifier has been demonstrated with this device under UV illumination. - Abstract: Schottky diodes have been fabricated on doped Si/SiO 2 substrates in air, by simply crossing individual electrospun tin oxide (SnO 2 ) and poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT-PSSA) nanoribbons. The conductivity of PEDOT-PSSA was ∼6 S/cm with no observable field effect, while SnO 2 exhibited n-doped field effect behavior with a charge mobility of ∼3.1 cm 2 /V-s. The diodes operate in air or in vacuum, under ambient illumination or in the dark, with low turn-on voltages and device parameters that are tunable via a back gate bias or a UV light source. Their unique design involves a highly localized active region that is completely exposed to the surrounding environment, making them potentially attractive for use as sensors. The standard thermionic emission model of a Schottky junction was applied to analyze the forward bias diode characteristics and was successfully tested as a half wave rectifier.

  7. Three-dimensional lattice rotation in GaAs nanowire growth on hydrogen-silsesquioxane covered GaAs (001) using molecular beam epitaxy

    Science.gov (United States)

    Tran, Dat Q.; Pham, Huyen T.; Higashimine, Koichi; Oshima, Yoshifumi; Akabori, Masashi

    2018-05-01

    We report on crystallographic behaviors of inclined GaAs nanowires (NWs) self-crystallized on GaAs (001) substrate. The NWs were grown on hydrogen-silsesquioxane (HSQ) covered substrates using molecular beam epitaxy (MBE). Commonly, the epitaxial growth of GaAs B (B-polar) NWs is prominently observed on GaAs (001); however, we yielded a remarkable number of epitaxially grown GaAs A (A-polar) NWs in addition to the majorly obtained B-polar NWs. Such NW orientations are always accompanied by a typical inclined angle of 35° from (001) plane. NWs with another inclined angle of 74° were additionally observed and attributed to be -oriented, not in direct epitaxial relation with the substrate. Such 74° NWs' existence is related to first-order three-dimensional (3D) lattice rotation taking place at the very beginning of the growth. It turns out that spatially 60° lattice rotation around directions at GaAs seeds is essentially in charge of A- and B-polar 74° NWs. Transmission electron microscope observations reveal a high density of twinning in the B-polar NWs and twin-free characteristic in the A-polar NWs.

  8. Controllable resistive switching in Au/Nb:SrTiO3 microscopic Schottky junctions

    Science.gov (United States)

    Wang, Yuhang; Shi, Xiaolan; Zhao, Kehan; Xie, Guanlin; Huang, Siyu; Zhang, Liuwan

    2016-02-01

    The reversible resistive switching effect at oxide interface shows promising applications in information storage and artificial intelligence. However, the microscopic switching mechanism is still elusive due to the difficulty of direct observation of the electrical and chemical behavior at the buried interface, which becomes a major barrier to design reliable, scalable, and reproducible devices. Here we used a gold-coated AFM tip as a removable electrode to investigate the resistive switching effect in a microscopic Au/Nb:SrTiO3 Schottky junction. We found that unlike the inhomogeneous random resistive switching in the macroscopic Schottky junctions, the high and low resistance states can be reversibly switched in a controllable way on the Nb-doped SrTiO3 surface by the conductive tip. The switching between the high and low resistance states in vacuum is accompanied by the reversible shift of the surface Fermi level. We indicate that the transfer of the interface oxygen ion in a double-well potential is responsible for the resistive switching in both macroscopic and microscopic Schottky junctions. Our findings provide a guide to optimize the key performance parameters of a resistive switching device such as operation voltage, switching speed, on/off ratio, and state retention time by proper electrode selection and fabrication strategy.

  9. Multiscale modeling of nanowire-based Schottky-barrier field-effect transistors for sensor applications

    International Nuclear Information System (INIS)

    Nozaki, D; Kunstmann, J; Zoergiebel, F; Cuniberti, G; Weber, W M; Mikolajick, T

    2011-01-01

    We present a theoretical framework for the calculation of charge transport through nanowire-based Schottky-barrier field-effect transistors that is conceptually simple but still captures the relevant physical mechanisms of the transport process. Our approach combines two approaches on different length scales: (1) the finite element method is used to model realistic device geometries and to calculate the electrostatic potential across the Schottky barrier by solving the Poisson equation, and (2) the Landauer-Buettiker approach combined with the method of non-equilibrium Green's functions is employed to calculate the charge transport through the device. Our model correctly reproduces typical I-V characteristics of field-effect transistors, and the dependence of the saturated drain current on the gate field and the device geometry are in good agreement with experiments. Our approach is suitable for one-dimensional Schottky-barrier field-effect transistors of arbitrary device geometry and it is intended to be a simulation platform for the development of nanowire-based sensors.

  10. Thermal activation of current in an inhomogeneous Schottky diode with a Gaussian distribution of barrier height

    International Nuclear Information System (INIS)

    Guo-Ping, Ru; Rong, Yu; Yu-Long, Jiang; Gang, Ruan

    2010-01-01

    This paper investigates the thermal activation behaviour of current in an inhomogeneous Schottky diode with a Gaussian distribution of barrier height by numerical simulation. The analytical Gaussian distribution model predicted that the I-V-T curves may intersect with the possibility of the negative thermal activation of current, but may be contradictory to the thermionic emission mechanism in a Schottky diode. It shows that the cause of the unphysical phenomenon is related to the incorrect calculation of current across very low barriers. It proposes that junction voltage V j , excluding the voltage drop across series resistance from the external bias, is a crucial parameter for correct calculation of the current across very low barriers. For correctly employing the thermionic emission model, V j needs to be smaller than the barrier height ø. With proper scheme of series resistance connection where the condition of V j > ø is guaranteed, I-V-T curves of an inhomogeneous Schottky diode with a Gaussian distribution of barrier height have been simulated, which demonstrate normal thermal activation. Although the calculated results exclude the intersecting possibility of I-V-T curves with an assumption of temperature-independent series resistance, it shows that the intersecting is possible when the series resistance has a positive temperature coefficient. Finally, the comparison of our numerical and analytical results indicates that the analytical Gaussian distribution model is valid and accurate in analysing I-V-T curves only for small barrier height inhomogeneity. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  11. Capacitance properties and simulation of the AlGaN/GaN Schottky heterostructure

    International Nuclear Information System (INIS)

    Harmatha, Ladislav; Ľubica, Stuchlíková; Juraj, Racko; Juraj, Marek; Juraj, Pecháček; Peter, Benko; Michal, Nemec; Juraj, Breza

    2014-01-01

    Highlights: • Dependences of CV characteristics of the AlGaN/GaN structure on frequency and temperature variations. • Identification of electrical activity of defects by capacitance DLTS. • Simulating the properties of the GaN/Al 0.2 GaN 0.8 /GaN Schottky heterostructure. - Abstract: The paper presents the results of capacitance measurements on GaN/AlGaN/GaN Schottky heterostructures grown on an Al 2 O 3 substrate by Low-Pressure Metal–Organic Vapour-Phase Epitaxy (LP-MOVPE). Dependences of the capacitance–voltage (CV) characteristics on the frequency of the measuring signal allow analysing the properties of the 2D electron gas (2DEG) at the AlGaN/GaN heterojunction. Exact location of the hetero-interface below the surface (20 nm) was determined from the concentration profile. Temperature variations of the CV curves reveal the influence of bulk defects in GaN and of the traps at the AlGaN/GaN interface. Electrical activity of these defects was characterized by capacitance Deep Level Transient Fourier Spectroscopy (DLTFS). Experimental results of CV measurements were supported by simulating the properties of the GaN/Al 0.2 GaN 0.8 /GaN Schottky heterostructure in dependence on the influence of the concentration of donor-like traps in GaN and of the temperature upon the CV curves

  12. Comparison of nickel, cobalt, palladium, and tungsten Schottky contacts on n-4H-silicon carbide

    Science.gov (United States)

    Gora, V. E.; Chawanda, A.; Nyamhere, C.; Auret, F. D.; Mazunga, F.; Jaure, T.; Chibaya, B.; Omotoso, E.; Danga, H. T.; Tunhuma, S. M.

    2018-04-01

    We have investigated the current-voltage (I-V) characteristics of nickel (Ni), cobalt (Co), tungsten (W) and palladium (Pd) Schottky contacts on n-type 4H-SiC in the 300-800 K temperature range. Results extracted from I-V measurements of Schottky barrier diodes showed that barrier height (ФBo) and ideality factor (n) were strongly dependent on temperature. Schottky barrier heights for contacts of all the metals showed an increase with temperature between 300 K and 800 K. This was attributed to barrier inhomogeneities at the interface between the metal and the semiconductor, which resulted in a distribution of barrier heights at the interface. Ideality factors of Ni, Co and Pd decreased from 1.6 to 1.0 and for W the ideality factor decreased from 1.1 to 1.0 when the temperature was increased from 300 K to 800 K respectively. The device parameters were compared to assess advantages and disadvantages of the metals for envisaged applications.

  13. A novel nanoscaled Schottky barrier based transmission gate and its digital circuit applications

    Science.gov (United States)

    Kumar, Sunil; Loan, Sajad A.; Alamoud, Abdulrahman M.

    2017-04-01

    In this work we propose and simulate a compact nanoscaled transmission gate (TG) employing a single Schottky barrier based transistor in the transmission path and a single transistor based Sajad-Sunil-Schottky (SSS) device as an inverter. Therefore, just two transistors are employed to realize a complete transmission gate which normally consumes four transistors in the conventional technology. The transistors used to realize the transmission path and the SSS inverter in the proposed TG are the double gate Schottky barrier devices, employing stacks of two metal silicides, platinum silicide (PtSi) and erbium silicide (ErSi). It has been observed that the realization of the TG gate by the proposed technology has resulted into a compact structure, with reduced component count, junctions, interconnections and regions in comparison to the conventional technology. The further focus of this work is on the application part of the proposed technology. So for the first time, the proposed technology has been used to realize various combinational circuits, like a two input AND gate, a 2:1 multiplexer and a two input XOR circuits. It has been observed that the transistor count has got reduced by half in a TG, two input AND gate, 2:1 multiplexer and in a two input XOR gate. Therefore, a significant reduction in transistor count and area requirement can be achieved by using the proposed technology. The proposed technology can be also used to perform the compact realization of other combinational and sequential circuitry in future.

  14. Visible to near-infrared photodetectors based on MoS2 vertical Schottky junctions.

    Science.gov (United States)

    Gong, Fan; Fang, He Hai; Wang, Peng; Su, Meng; Li, Qing; Ho, Johnny; Chen, Xiaoshuang; Lu, Wei; Liao, Lei; Wang, Jun; Hu, Wei-Da

    2017-10-05

    Over the past few years, two-dimensional (2D) nanomaterials, such as MoS2, have been widely considered as the promising channel materials for next-generation high-performance phototransistors. However, their device performances are still mostly suffered from the slow photoresponse (e.g. with the time constant in the order of milliseconds) due to the relatively long channel length and the substantial surface defect induced carrier trapping, as well as the insufficient detectivity owing to the relatively large dark current. In this work, a simple multilayer MoS2 based photodetectors employing vertical Schottky junctions of Au-MoS2-ITO is demonstrated. This unique device structure can significantly suppress the dark current down to 10-12 A and enable the fast photoresponse of 64 μs, together with the stable responsivity of ~1 A/W and the high photocurrent to dark current ratio of ~106 at room temperature. This vertical-Schottky photodetector can also exhibit a wide detection range from visible to 1000 nm. All these results demonstrate clearly that the vertical Schottky structure is an effective configuration for achieving high-performance optoelectronic devices based on 2D materials. © 2017 IOP Publishing Ltd.

  15. Tuning the tunneling probability by mechanical stress in Schottky barrier based reconfigurable nanowire transistors

    Science.gov (United States)

    Baldauf, Tim; Heinzig, André; Trommer, Jens; Mikolajick, Thomas; Weber, Walter Michael

    2017-02-01

    Mechanical stress is an established and important tool of the semiconductor industry to improve the performance of modern transistors. It is well understood for the enhancement of carrier mobility but rather unexplored for the control of the tunneling probability for injection dominated research devices based on tunneling phenomena, such as tunnel FETs, resonant tunnel FETs and reconfigurable Schottky FETs. In this work, the effect of stress on the tunneling probability and overall transistor characteristics is studied by three-dimensional device simulations in the example of reconfigurable silicon nanowire Schottky barrier transistors using two independently gated Schottky junctions. To this end, four different stress sources are investigated. The effects of mechanical stress on the average effective tunneling mass and on the multi-valley band structure applying the deformation potential theory are being considered. The transfer characteristics of strained transistors in n- and p-configuration and corresponding charge carrier tunneling are analyzed with respect to the current ratio between electron and hole conduction. For the implementation of these devices into complementary circuits, the mandatory current ratio of unity can be achieved by appropriate mechanical stress either by nanowire oxidation or the application of a stressed top layer.

  16. X-ray imaging bilinear staggered GaAs detectors

    Energy Technology Data Exchange (ETDEWEB)

    Achmadullin, R.A.; Dvoryankin, V.F. E-mail: vfd217@ire216.msk.su; Dvoryankina, G.G.; Dikaev, Y.M.Yu.M.; Krikunov, A.I.; Kudryashov, A.A.; Panova, T.M.; Petrov, A.G.; Telegin, A.A

    2004-09-21

    The multichannel bilinear X-ray detector based on epitaxial GaAs structures is developed to obtain a digital X-ray image. Each detector operates in photovoltaic mode without reverse bias that enables almost complete elimination of detector noise arising due to leakage currents. The sensitivity range of the epitaxial GaAs photovoltaic X-ray detector covers the effective energies from 8 to 120 keV. A maximum response of the detector operating in the short-circuit mode was observed at an energy of 35 keV and amounted to 30 {mu}A min/(Gy cm{sup 2}). The multichannel detector was made of 1024 pixels with pitch of 0.8 mm. The spatial resolution of double staggered sensor row is twice as high as the resolution of that of single sensor row with the same pitch. Measured spatial resolution is 1.2 line-pairs/mm, contrast sensitivity not worse 1% and dynamic range defined as the ratio of maximum detectable X-ray signal to electronic noise level more than 2000 are received.

  17. X-ray imaging bilinear staggered GaAs detectors

    International Nuclear Information System (INIS)

    Achmadullin, R.A.; Dvoryankin, V.F.; Dvoryankina, G.G.; Dikaev, Y.M.Yu.M.; Krikunov, A.I.; Kudryashov, A.A.; Panova, T.M.; Petrov, A.G.; Telegin, A.A.

    2004-01-01

    The multichannel bilinear X-ray detector based on epitaxial GaAs structures is developed to obtain a digital X-ray image. Each detector operates in photovoltaic mode without reverse bias that enables almost complete elimination of detector noise arising due to leakage currents. The sensitivity range of the epitaxial GaAs photovoltaic X-ray detector covers the effective energies from 8 to 120 keV. A maximum response of the detector operating in the short-circuit mode was observed at an energy of 35 keV and amounted to 30 μA min/(Gy cm 2 ). The multichannel detector was made of 1024 pixels with pitch of 0.8 mm. The spatial resolution of double staggered sensor row is twice as high as the resolution of that of single sensor row with the same pitch. Measured spatial resolution is 1.2 line-pairs/mm, contrast sensitivity not worse 1% and dynamic range defined as the ratio of maximum detectable X-ray signal to electronic noise level more than 2000 are received

  18. Low-energy particle treatment of GaAs surface

    International Nuclear Information System (INIS)

    Pincik, E.; Ivanco, J.; Brunner, R.; Jergel, M.; Falcony, C.; Ortega, L.; Kucera, J. M.

    2002-01-01

    The paper presents results of a complex study of surface properties of high-doped (2x10 18 cm -3 ) and semi-insulating GaAs after an interaction with the particles coming from low-energy ion sources such as RF plasma and ion beams. The virgin samples were mechano-chemically polished liquid-encapsulated Czochralski-grown GaAs (100) oriented wafers. The crystals were mounted on the grounded electrode (holder). The mixture Ar+H 2 as well as O 2 and CF 4 were used as working gases: In addition, a combination of two different in-situ exposures was applied, such as e.g. hydrogen and oxygen. Structural, electrical and optical properties of the exposed surfaces were investigated using X-ray diffraction at grazing incidence, quasi-static and high-frequency C-V curve measurements, deep-level transient spectroscopy, photo-reflectance, and photoluminescence. Plasma and ion beam exposures were performed in a commercial RF capacitively coupled plasma equipment SECON XPL-200P and a commercial LPAI device, respectively. The evolution of surface properties as a function of the pressure of working gas and the duration of exposure was observed. (Authors)

  19. Tight-binding analysis of current oscillation in nanoscale In0.53Ga0.47As Schottky MOSFET

    Science.gov (United States)

    Ahangari, Zahra; Fathipour, Morteza

    2013-11-01

    A comprehensive study of band structure effect on the quantum transport of nanoscale In0.53Ga0.47As Schottky MOSFET for the implementation of III-V MOSFET with low source/drain series resistance is presented. Rigorous treatment of the full band structure in ultra-thin body MOSFET is employed using sp3d5s* tight-binding approach. Strong transverse confinement increases the energy of subbands and, indeed, the effective Schottky barrier height. Due to enhanced Schottky barriers and at low drain voltages, a double barrier gate modulated potential well is created along the channel that results in source-to-drain confinement of states. As tunnelling is the main current component in this device, longitudinal confinement induces drain current oscillation at low temperatures. Important factors that may affect current oscillation are demonstrated. Current oscillation that alters the normal performance of the device is investigated in nanowire Schottky MOSFET, as well. Additional quantum confinement in nanowire Schottky MOSFET provides higher effective Schottky barrier height than the double gate structure. Accordingly, the drain current oscillation is more apparent in nanowire Schottky MOSFET than in the double gate device and is gradually smoothed out as the gate length shrinks down in ultra-scaled structure. Effect of diffusive scattering on the quantum transport of the device is investigated, too. What is prominent in our result is that the drain current oscillations degrade as the channel mobility is decreased. The results in this paper are paving a way to elucidate the feasibility of this device in the nanoscale regime.

  20. Comparative study of GaN and GaAs photocathodes

    Science.gov (United States)

    Qiao, Jianliang; Chang, Benkang; Yang, Zhi; Tian, Si; Gao, Youtang

    2008-02-01

    Taking GaAs and GaN as representation, negative electron affinity (NEA) photocathode has many virtues, such as high quantum efficiency, low dark current, concentrated electrons energy distribution and angle distribution, adjustive long-wave threshold, great potential to extend the long-wave spectral response waveband. Therefore it plays more and more important effect in high performance image intensifiers and polarized electron sources. GaN NEA photocathode and GaAs NEA photocathode are very similar because they all belong to III-V compound. But, GaN photocathode and GaAs photocathode have many difference in such aspects as preparation process, activation manners, stability and application field etc. In this paper, using the multi-information measurement and evaluation system of photocathode, the preparation processes of native reflection-mode GaN photocathode and GaAs photocathode are studied. The different activation manners of GaN photocathode and GaAs photocathode are compared and analyzed. The spectral response and stability of the two kind of photocathode are compared also. The experiments indicate: the atomically clean degree of NEA photocathode surface and the structure of activation layer are the main factors that influence photocathode sensitivity and stability after activation. GaN photocathode and GaAs photocathode have good NEA property and large quantum yield. Compare with GaAs photocathode, GaN photocathode has high stability, and the decay of the quantum yield is comparatively slow.

  1. Synthesis of GaAs quantum dots on Si-layers on AlGaAs films grown on GaAs(100) substrates

    International Nuclear Information System (INIS)

    Mendez-Garcia, V. H.; Zamora-Peredo, L.; Saucedo-Zeni, N.

    2002-01-01

    In this work we report a novel method for obtaining GaAs quantum dots by molecular beam epitaxy (MBE) on an AlGaAs underlying film. We propose to use a Si monolayer (ML) grown on AlGaAs, in order to induce a 3D nucleation during the GaAs overgrowth. The samples were prepared in a Riber 32P MBE system employing undoped Si-GaAs(100) substrates. First, a 500 nm thick layer of Al x Ga 1-x As was grown with a nominal concentration x=0.35. Several samples were grown in order to analyze the effects of changing the Si interlayer thickness, and the amount of GaAs overgrowth, on the final structures. Previous to the Si-exposure, the AlGaAs presented a (1x3) surface reconstruction which gradually turned to a (3x1) structure when the Si-thickness was 1 ML, as observed in the reflection high-energy electron diffraction (RHEED) patterns. When the GaAs overgrowth started on this surface, transmission RHEED spots appeared and showed a considerable increase in intensity until reaching a maximum. This behavior is typical from a 3D island growth. If the GaAs overgrowth continues, the initial streaky RHEED patterns recovered indicating a 2D-growth. Thus, we prepared a sample stopping the GaAs overgrowth at the time when the diffraction 3D spot reached the maximum intensity, equivalent to 2ML of GaAs. The sample surface was analyzed in air by atomic force microscopy (AFM). Islands of 1.5 nm-height and 20x20 nm of base were clearly observed, these dimensions are suitable for applications in quantum dots. (Authors)

  2. Hydrodynamic electronic fluid instability in GaAs MESFETs at terahertz frequencies

    Science.gov (United States)

    Li, Kang; Hao, Yue; Jin, Xiaoqi; Lu, Wu

    2018-01-01

    III–V compound semiconductor field effect transistors (FETs) are potential candidates as solid state THz emitters and detectors due to plasma wave instability in these devices. Using a 2D hydrodynamic model, here we present the numerical studies of electron fluid instability in a FET structure. The model is implemented in a GaAs MESFET structure with a gate length of 0.2 µm as a testbed by taking into account the non-equilibrium transport and multi-valley non-parabolicity energy bands. The results show that the electronic density instability in the channel can produce stable periodic oscillations at THz frequencies. Along with stable oscillations, negative differential resistance in output characteristics is observed. The THz emission energy density increases monotonically with the drain bias. The emission frequency of electron density oscillations can be tuned by both gate and drain biases. The results suggest that III–V FETs can be a kind of versatile THz devices with good tunability on both radiative power and emission frequency.

  3. Study of the electrical parameters degradation of GaAs sub-cells for triple junction space solar cells by computer simulation

    Science.gov (United States)

    Cappelletti, M. A.; Casas, G. A.; Morales, D. M.; Hasperue, W.; Blancá, E. L. Peltzer y.

    2016-11-01

    In this paper, a theoretical study of the electrical parameters degradation of different n-type GaAs sub-cells for InGaP/GaAs/Ge triple junction solar cells irradiated with 1 and 5 MeV electrons has been performed by means of computer simulation. Effects of base carrier concentration upon the maximum power point, short-circuit current, open circuit voltage, diffusion current, recombination current and series resistance of these devices have been researched using the displacement damage dose method, the one-dimensional PC1D device modeling program and a home-made numerical code based on genetic algorithms. The radiative recombination lifetime, damage constant for minority-carrier lifetime and carrier removal rate models for GaAs sub-cells have been used in the simulations. An analytical model has been proposed, which is useful to describe the radiation-induced degradation of diffusion current, recombination current and series resistance. Results obtained in this work can be used to predict the radiation resistance of solar cells over a wide range of energies.

  4. MeV Implantation Studies in LPE-Grown GaAs and InP

    Science.gov (United States)

    1989-03-31

    expected in 1991. 1. LPE growth of In-doped GaAs and Characterization (reprint attached ): With an objective of obtaining a high-quality starting...material for the MeV ion- implatation study, we doped GaAs with Indium in a concentration ranging from 1 x 1019 to I x 1020 cm ŗ. Liquid Phase Epitaxy...2. MeV ion damage effect in the strained GaInAs epitaxial layer on GaAs (001) substrates (reprints attached ) : Various Gal.InxAs/GaAs (001) single

  5. Characterization of a Ga-assisted GaAs nanowire array solar cell on si substrate

    DEFF Research Database (Denmark)

    Boulanger, J. P.; Chia, A. C. E.; Wood, B.

    2016-01-01

    A single-junction core-shell GaAs nanowire (NW) solar cell on Si (1 1 1) substrates is presented. A Ga-assisted vapor–liquid–solid growth mechanism was used for the formation of a patterned array of radial p-i-n GaAs NWs encapsulated in AlInP passivation. Novel device fabrication utilizing facet......-dependent properties to minimize passivation layer removal for electrical contacting is demonstrated. Thorough electrical characterization and analysis of the cell is reported. The electrostatic potential distribution across the radial p-i-n junction GaAs NW is investigated by off-axis electron holography....

  6. Exploration of GaAs structures for solid-state detectors

    International Nuclear Information System (INIS)

    Chmil', V.B.; Chuntonov, A.V.; Sergeev, V.A.

    1992-01-01

    The work describes the rsults on systematic search of GaAs structures for the solid-state detectors that should be exploited in a high flux of high energy particles and low energy neutrons. Three types of GaAs structures were found that can separate well a noise and signal spectra. The GaAs samples have been irradiated with a source of γ-ray and results of the response to the action of β-source are also presented. 7 refs.; 6 figs

  7. A comparative study of Mg and Pt contacts on semi-insulating GaAs: Electrical and XPS characterization

    International Nuclear Information System (INIS)

    Dubecký, F.; Kindl, D.; Hubík, P.; Mičušík, M.; Dubecký, M.; Boháček, P.; Vanko, G.; Gombia, E.; Nečas, V.; Mudroň, J.

    2017-01-01

    Highlights: • Explored were diodes with full-area low/high work function metal contacts on semi-insulating GaAs (S). • The Mg-S-Mg diode is promising for radiation detectors for its low high-field current. • The XPS analysis of Mg-S interface shows presence of MgO instead of Mg metal. - Abstract: We present a comparative study of the symmetric metal-SI GaAs-metal (M-S-M) diodes with full-area contacts on both device sides, in order to demonstrate the effect of contact metal work function in a straightforward way. We compare the conventional high work function Pt contact versus the less explored low work function Mg contact. The Pt-S-Pt, Mg-S-Mg and mixed Mg-S-Pt structures are characterized by the current-voltage measurements, and individual Pt-S and Mg-S contacts are investigated by the X-ray photoelectron spectroscopy (XPS). The transport measurements of Mg-S-Pt structure show a significant current decrease at low bias while the Mg-S-Mg structure shows saturation current at high voltages more than an order of magnitude lower with respect to the Pt-S-Pt reference. The phenomena observed in Mg-containing samples are explained by the presence of insulating MgO layer at the M-S interface, instead of the elementary Mg, as confirmed by the XPS analysis. Alternative explanations of the influence of MgO layer on the effective resistance of the structures are presented. The reported findings have potential applications in M-S-M sensors and radiation detectors based on SI GaAs.

  8. Response of Ni/4H-SiC Schottky barrier diodes to alpha-particle irradiation at different fluences

    Energy Technology Data Exchange (ETDEWEB)

    Omotoso, E., E-mail: ezekiel.omotoso@up.ac.za [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa); Departments of Physics, Obafemi Awolowo University, Ile-Ife 220005 (Nigeria); Meyer, W.E.; Auret, F.D.; Diale, M.; Ngoepe, P.N.M. [Department of Physics, University of Pretoria, Private Bag X20, Hatfield 0028 (South Africa)

    2016-01-01

    Irradiation experiments have been carried out on 1.9×10{sup 16} cm{sup −3} nitrogen-doped 4H-SiC at room temperature using 5.4 MeV alpha-particle irradiation over a fluence ranges from 2.6×10{sup 10} to 9.2×10{sup 11} cm{sup −2}. Current–voltage (I–V), capacitance–voltage (C–V) and deep level transient spectroscopy (DLTS) measurements have been carried out to study the change in characteristics of the devices and free carrier removal rate due to alpha-particle irradiation, respectively. As radiation fluence increases, the ideality factors increased from 1.20 to 1.85 but the Schottky barrier height (SBH{sub I–V}) decreased from 1.47 to 1.34 eV. Free carrier concentration, N{sub d} decreased with increasing fluence from 1.7×10{sup 16} to 1.1×10{sup 16} cm{sup −2} at approximately 0.70 μm depth. The reduction in N{sub d} shows that defects were induced during the irradiation and have effect on compensating the free carrier. The free carrier removal rate was estimated to be 6480±70 cm{sup −1}. Alpha-particle irradiation introduced two electron traps (E{sub 0.39} and E{sub 0.62}), with activation energies of 0.39±0.03 eV and 0.62±0.08 eV, respectively. The E{sub 0.39} as attribute related to silicon or carbon vacancy, while the E{sub 0.62} has the attribute of Z{sub 1}/Z{sub 2}.

  9. The electronic and optical properties of quaternary GaAs1-x-y N x Bi y alloy lattice-matched to GaAs: a first-principles study.

    Science.gov (United States)

    Ma, Xiaoyang; Li, Dechun; Zhao, Shengzhi; Li, Guiqiu; Yang, Kejian

    2014-01-01

    First-principles calculations based on density functional theory have been performed for the quaternary GaAs1-x-y N x Bi y alloy lattice-matched to GaAs. Using the state-of-the-art computational method with the Heyd-Scuseria-Ernzerhof (HSE) hybrid functional, electronic, and optical properties were obtained, including band structures, density of states (DOSs), dielectric function, absorption coefficient, refractive index, energy loss function, and reflectivity. It is found that the lattice constant of GaAs1-x-y N x Bi y alloy with y/x =1.718 can match to GaAs. With the incorporation of N and Bi into GaAs, the band gap of GaAs1-x-y N x Bi y becomes small and remains direct. The calculated optical properties indicate that GaAs1-x-y N x Bi y has higher optical efficiency as it has less energy loss than GaAs. In addition, it is also found that the electronic and optical properties of GaAs1-x-y N x Bi y alloy can be further controlled by tuning the N and Bi compositions in this alloy. These results suggest promising applications of GaAs1-x-y N x Bi y quaternary alloys in optoelectronic devices.

  10. Generation of X-rays by 850 MeV electrons in a novel periodic multicrystal structure on a GaAs plate surface

    International Nuclear Information System (INIS)

    Kaplin, V.V.; Uglov, S.R.; Zabaev, V.N.; Kanaev, V.G.; Litvin, S.V.; Timchenko, N.A.

    2000-01-01

    A novel type of a periodical crystalline target for the generation of coherent X-rays by relativistic electrons is described. The target has been done on the surface of a GaAs crystal plate by means of microlitography. The etched microstructure is a system of about 300 stripes 14 μm thick, 100 μm high and the gaps between the stripes are 29 μm. The measured spectra and orientational dependences of the X-rays emitted at an angle of 19 deg. to the 850 MeV electron beam of the Tomsk synchrotron are discussed. The generated 63 keV radiation consists of parametric X-ray radiation (PXR) and diffracted X-ray transition radiation (DTR). It has been shown that the intensity of the DTR component of the generated X-rays is much more great than that of the PXR

  11. Generation of X-rays by 850 MeV electrons in a novel periodic multicrystal structure on a GaAs plate surface

    CERN Document Server

    Kaplin, V V; Zabaev, V N; Kanaev, V G; Litvin, S V; Timchenko, N A

    2000-01-01

    A novel type of a periodical crystalline target for the generation of coherent X-rays by relativistic electrons is described. The target has been done on the surface of a GaAs crystal plate by means of microlitography. The etched microstructure is a system of about 300 stripes 14 mu m thick, 100 mu m high and the gaps between the stripes are 29 mu m. The measured spectra and orientational dependences of the X-rays emitted at an angle of 19 deg. to the 850 MeV electron beam of the Tomsk synchrotron are discussed. The generated 63 keV radiation consists of parametric X-ray radiation (PXR) and diffracted X-ray transition radiation (DTR). It has been shown that the intensity of the DTR component of the generated X-rays is much more great than that of the PXR.

  12. Wet-etched phononic crystal waveguiding on GaAs

    Science.gov (United States)

    Muzar, Edward; Azodi Aval, Golnaz; Stotz, James A. H.

    2018-01-01

    A wet-etched phononic crystal waveguide in GaAs with approximately two micron deep inclusions is studied both numerically and experimentally for controlled surface acoustic wave propagation. Numerically, the phononic crystal was modelled using the finite element method (FEM) with COMSOL Multiphysics, and the surface displacement of the acoustic waves was measured using optical interferometry. The computed filter response of the phononic crystal confirmed that the phononic crystal was an effective stop band filter in the interval of 400 MHz and 450 MHz. An L1 linear defect waveguide with a stepped funnel entrance design is shown to perform well at a surface acoustic wave frequency of 410.344 MHz and in agreement to simulated results. The phononic crystal waveguide system shows promise for use in acoustic control of GaAs-based quantum nanostructures.

  13. Self-healing in fractured GaAs nanowires

    International Nuclear Information System (INIS)

    Wang Jun; Lu Chunsheng; Wang Qi; Xiao Pan; Ke Fujiu; Bai Yilong; Shen Yaogen; Wang Yanbo; Chen Bin; Liao Xiaozhou; Gao Huajian

    2012-01-01

    Molecular dynamics simulations are performed to investigate a spontaneous self-healing process in fractured GaAs nanowires with a zinc blende structure. The results show that such self-healing can indeed occur via rebonding of Ga and As atoms across the fracture surfaces, but it can be strongly influenced by several factors, including wire size, number of healing cycles, temperature, fracture morphology, oriented attachment and atomic diffusion. For example, it is found that the self-healing capacity is reduced by 46% as the lateral dimension of the wire increases from 2.3 to 9.2 nm, and by 64% after 24 repeated cycles of fracture and healing. Other factors influencing the self-healing behavior are also discussed.

  14. Observation of the anomalous Hall effect in GaAs

    International Nuclear Information System (INIS)

    Miah, M Idrish

    2007-01-01

    Devices for the direct detection of the spin current, based on the anomalous Hall effect (AHE), are fabricated on n-type GaAs bulk semiconductor materials. The AHE is observed in the device when the photoinduced spin-polarized electrons are injected into it, and it is found that the effect depends on the applied electric field. The origin of the field-dependent observed Hall effect is discussed based on the D'yakonov-Perel' (DP) spin relaxation mechanism. The spin-dependent Hall effect is also found to be enhanced with increasing doping concentration. The present experimental results might have potential applications in semiconductor spintronic devices since the effect is closely related to the spin Hall effect

  15. Observation of the anomalous Hall effect in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Miah, M Idrish [Nanoscale Science and Technology Centre, School of Science, Griffith University, Nathan, Brisbane, QLD 4111 (Australia); Department of Physics, University of Chittagong, Chittagong, Chittagong - 4331 (Bangladesh)

    2007-03-21

    Devices for the direct detection of the spin current, based on the anomalous Hall effect (AHE), are fabricated on n-type GaAs bulk semiconductor materials. The AHE is observed in the device when the photoinduced spin-polarized electrons are injected into it, and it is found that the effect depends on the applied electric field. The origin of the field-dependent observed Hall effect is discussed based on the D'yakonov-Perel' (DP) spin relaxation mechanism. The spin-dependent Hall effect is also found to be enhanced with increasing doping concentration. The present experimental results might have potential applications in semiconductor spintronic devices since the effect is closely related to the spin Hall effect.

  16. Electrical properties of Al foil/n-4H-SiC Schottky junctions fabricated by surface-activated bonding

    Science.gov (United States)

    Morita, Sho; Liang, Jianbo; Matsubara, Moeko; Dhamrin, Marwan; Nishio, Yoshitaka; Shigekawa, Naoteru

    2018-02-01

    We fabricate 17-µm-thick Al foil/n-4H-SiC Schottky junctions by surface-activated bonding. Their current–voltage and capacitance–voltage characteristics are compared with those of Schottky junctions fabricated by evaporating Al layers on n-4H-SiC epilayers. We find that the ideality factor of Al foil/SiC junctions is larger than that of conventional junctions, which is due to the irradiation of the fast atom beam (FAB) of Ar. The ideality factor of Al foil/SiC junctions is improved by annealing at 400 °C. We also find that the Schottky barrier height is increased by FAB irradiation, which is likely to be due to the negative charges formed at SiC surfaces.

  17. Ultra-low leakage and high breakdown Schottky diodes fabricated on free-standing GaN substrate

    International Nuclear Information System (INIS)

    Wang, Yaqi; Alur, Siddharth; Sharma, Yogesh; Tong, Fei; Thapa, Resham; Gartland, Patrick; Issacs-Smith, Tamara; Ahyi, Claude; Williams, John; Park, Minseo; Johnson, Mark; Paskova, Tanya; Preble, Edward A; Evans, Keith R

    2011-01-01

    Vertical Schottky diodes were fabricated on the bulk GaN substrate with decreasing impurity concentration from N-face to Ga-face. An array of circular Pt Schottky contacts and a full backside Ti/Al/Ni/Au ohmic contact were prepared on the Ga-face and the N-face of the n-GaN substrate, respectively. The Schottky diode exhibits a minimum specific on-state resistance of 1.3 mΩ cm 2 and a maximum breakdown voltage of 600 V, resulting in a figure-of- merit of 275 MW cm −2 . An ultra-low reverse leakage current density of 3.7 × 10 −4 A cm −2 at reverse bias of 400 V was observed. Temperature-dependent I–V measurements were also carried out to study the forward and reverse transportation mechanisms. (fast track communication)

  18. Schottky graphene/Si photodetector based on metal-dielectric hybrid hollow-core photonic crystal fibers.

    Science.gov (United States)

    Hosseinifar, Mitra; Ahmadi, Vahid; Ebnali-Heidari, Majid

    2017-12-15

    This Letter presents a new family of Schottky graphene/silicon (Si) photodetectors (PDs) based on hollow-core photonic crystal fibers (HPCFs), working at both optical communication and room temperature. The proposed structure has the advantage of plasmonic HPCFs in a slow-light regime, and the absorption mechanism is based on an internal photoemission effect. The main feature of this structure is that the enhanced electric field is strongly localized in the hollow core of the guided core mode with the surface plasmon modes at the surface metal wires embedded in the photonic crystal structure. For the proposed graphene/silicon Schottky PD, numerical simulation predicts responsivity of ∼0.39  A/W, and continuous-wave sensitivity of -59  dBm, which reveals substantial improvements compared to that of typical metal/Si Schottky PDs.

  19. The apparent effect of sample surface damage on the dielectric parameters of GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Engelbrecht, J.A.A. [Physics Department, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa)], E-mail: Japie.Engelbrecht@nmmu.ac.za; Hashe, N.G. [Physics Department, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa); Hillie, K.T. [CSIR-NML Laboratory, P.O. Box 395, Pretoria 0001 (South Africa); Claassens, C.H. [Physics Department, University of the Free State, Bloemfontein 9300 (South Africa)

    2007-12-15

    The dielectric and optical parameters determined by infrared reflectance spectroscopy and computer simulation of a set of GaAs substrates of various surface topologies are reported. The influence of surface damage on the parameters is noted.

  20. The apparent effect of sample surface damage on the dielectric parameters of GaAs

    International Nuclear Information System (INIS)

    Engelbrecht, J.A.A.; Hashe, N.G.; Hillie, K.T.; Claassens, C.H.

    2007-01-01

    The dielectric and optical parameters determined by infrared reflectance spectroscopy and computer simulation of a set of GaAs substrates of various surface topologies are reported. The influence of surface damage on the parameters is noted

  1. Growth and characteristics of p-type doped GaAs nanowire

    Science.gov (United States)

    Li, Bang; Yan, Xin; Zhang, Xia; Ren, Xiaomin

    2018-05-01

    The growth of p-type GaAs nanowires (NWs) on GaAs (111) B substrates by metal-organic chemical vapor deposition (MOCVD) has been systematically investigated as a function of diethyl zinc (DEZn) flow. The growth rate of GaAs NWs was slightly improved by Zn-doping and kink is observed under high DEZn flow. In addition, the I–V curves of GaAs NWs has been measured and the p-type dope concentration under the II/III ratio of 0.013 and 0.038 approximated to 1019–1020 cm‑3. Project supported by the National Natural Science Foundation of China (Nos. 61376019, 61504010, 61774021) and the Fund of State Key Laboratory of Information Photonics and Optical Communications (Beijing University of Posts and Telecommunications), China (Nos. IPOC2017ZT02, IPOC2017ZZ01).

  2. High Purity GaAs Far IR Photoconductor With Enhanced Quantum Efficieny, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — This proposal introduces an innovative concept aimed to significantly enhance the quantum efficiency of a far-infrared GaAs photoconductor and achieve sensitivity...

  3. Initial test of an rf gun with a GaAs cathode installed

    International Nuclear Information System (INIS)

    Aulenbacher, K.; Bossart, R.; Braun, H.

    1996-09-01

    The operation of an rf gun with a GaAs crystal installed as the cathode has been tested in anticipation of eventually producing a polarized electron beam for a future e + /e - collider using an rf photoinjector

  4. Transport and magnetic properties of Mn- and Mg-implanted GaAs layers

    International Nuclear Information System (INIS)

    Kulbachinskii, V.A.; Lunin, R.A.; Gurin, P.V.; Perov, N.S.; Sheverdyaeva, P.M.; Danilov, Yu.A.

    2006-01-01

    Mn-doped GaAs layers were fabricated by direct ion implantation into semi-insulating GaAs (100) substrates. The implanted samples were annealed at temperatures T a =700-800 o C. At these temperatures MnAs clusters are formed in GaAs due to decay of the supersaturated solid solution of Mn in GaAs. Additional Mg ion implantation was used to provide an enhancement of p-type doping in (Ga,Mn)As layers. Temperature dependence of resistance was measured between 4.2 and 300K, and the Hall effect was measured at temperatures of 4.2-200K. Anomalous Hall effect and ferromagnetic behavior have been found for all samples. An enhanced positive magnetoresistance was also observed at T>30K

  5. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy

    Directory of Open Access Journals (Sweden)

    Takeo Ohno and Yutaka Oyama

    2012-01-01

    Full Text Available In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE, in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm-2. They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor.

  6. CMOS compatible route for GaAs based large scale flexible and transparent electronics

    KAUST Repository

    Nour, Maha A.

    2014-08-01

    Flexible electronics using gallium arsenide (GaAs) for nano-electronics with high electron mobility and optoelectronics with direct band gap are attractive for many applications. Here we describe a state-of-the-art CMOS compatible batch fabrication process of transforming traditional electronic circuitry into large-area flexible, semitransparent platform. We show a simple release process for peeling off 200 nm of GaAs from 200 nm GaAs/300 nm AlAs stack on GaAs substrate using diluted hydrofluoric acid (HF). This process enables releasing a single top layer compared to peeling off all layers with small sizes at the same time. This is done utilizing a network of release holes which contributes to the better transparency (45 % at 724 nm wavelength) observed.

  7. Pulsed laser heating of silicon-nitride capped GaAs: Optical properties at high temperature

    Science.gov (United States)

    Bhat, A.; Yao, H. D.; Compaan, A.; Horak, A.; Rys, A.

    1988-09-01

    The optical properties of silicon nitride and gallium arsenide were studied at temperatures up to and beyond the melting point of GaAs by means of laser heating. XeCl excimer and pulsed dye laser pulses, ˜10 ns in duration, were used to heat the semiconductor under nitride capping layers of varying thickness. The transient reflectivity response at 514.5 nm was used together with a multilayer interference analysis to obtain the optical constants of solid and molten GaAs and of solid Si3N4 near the 1513-K melting point of GaAs. In addition, we report the melt duration as a function of laser pulse energy for GaAs with and without capping layers.

  8. Capacitance properties and simulation of the AlGaN/GaN Schottky heterostructure

    Energy Technology Data Exchange (ETDEWEB)

    Harmatha, Ladislav, E-mail: ladislav.harmatha@stuba.sk; Ľubica, Stuchlíková; Juraj, Racko; Juraj, Marek; Juraj, Pecháček; Peter, Benko; Michal, Nemec; Juraj, Breza

    2014-09-01

    Highlights: • Dependences of CV characteristics of the AlGaN/GaN structure on frequency and temperature variations. • Identification of electrical activity of defects by capacitance DLTS. • Simulating the properties of the GaN/Al{sub 0.2}GaN{sub 0.8}/GaN Schottky heterostructure. - Abstract: The paper presents the results of capacitance measurements on GaN/AlGaN/GaN Schottky heterostructures grown on an Al{sub 2}O{sub 3} substrate by Low-Pressure Metal–Organic Vapour-Phase Epitaxy (LP-MOVPE). Dependences of the capacitance–voltage (CV) characteristics on the frequency of the measuring signal allow analysing the properties of the 2D electron gas (2DEG) at the AlGaN/GaN heterojunction. Exact location of the hetero-interface below the surface (20 nm) was determined from the concentration profile. Temperature variations of the CV curves reveal the influence of bulk defects in GaN and of the traps at the AlGaN/GaN interface. Electrical activity of these defects was characterized by capacitance Deep Level Transient Fourier Spectroscopy (DLTFS). Experimental results of CV measurements were supported by simulating the properties of the GaN/Al{sub 0.2}GaN{sub 0.8}/GaN Schottky heterostructure in dependence on the influence of the concentration of donor-like traps in GaN and of the temperature upon the CV curves.

  9. Investigation of the electrical parameters of Ag/p-TlGaSeS/C Schottky contacts

    Energy Technology Data Exchange (ETDEWEB)

    Qasrawi, A.F., E-mail: aqasrawi@atilim.edu.tr [Group of Physics, Faculty of Engineering, Atilim University, 06836 Ankara (Turkey); Department of Physics, Arab-American University, Jenin, West Bank, Palestine (Country Unknown); Gasanly, N.M. [Department of Physics, Middle East Technical University, 06800 Ankara (Turkey)

    2012-07-25

    Highlights: Black-Right-Pointing-Pointer Ag/p-TlGaSeS/C Schottky devices are designed and characterized. Black-Right-Pointing-Pointer The device ideality factor and barrier heights are 1.2 and 0.74 eV, respectively. Black-Right-Pointing-Pointer It displayed wide and narrow RF bands at 13.200 and 62.517 kHz, respectively. Black-Right-Pointing-Pointer The relative Q values are found to be 1.4 and of 6.3 Multiplication-Sign 10{sup 4}, respectively. - Abstract: p-type TlGaSeS single crystal was used to fabricate a Schottky device. Silver and carbon metals were used as the Ohmic and Schottky contacts, respectively. The device which displayed wide RF band at 13.200 and narrow band at 62.517 kHz with Q value of 1.4 and of 6.3 Multiplication-Sign 10{sup 4}, respectively, is characterized by means of current (I)-voltage (V), capacitance (C)-voltage characteristics as well as capacitance-frequency (f) characteristics. The device series resistance, ideality factor and barrier height are determined from the I-V curve as 35.8 M{Omega}, 1.2 and 0.74 eV, respectively. The apparent acceptor density and the build in voltage of the device increased with increasing ac signal frequency. The high Q value, observed at 62.517 kHz, indicated a much lower rate of energy loss relative to the stored energy of the device. The energy loss (Q{sup -1}) is much less than 0.001% of the stored value. The device was tested and found to remain at the same mode of resonance for several hours. It never switched or ceased unless it was tuned off.

  10. Diameter-dependent electronic transport properties of Au-catalyst/Ge-nanowire Schottky diodes

    Energy Technology Data Exchange (ETDEWEB)

    Picraux, S Thomas [Los Alamos National Laboratory; Leonard, Francois [SNL; Swartzentruber, Brian S [SNL; Talin, A Alee [SNL

    2008-01-01

    We present electronic transport measurements in individual Au-catalyst/Ge-nanowire interfaces demonstrating the presence of a Schottky barrier. Surprisingly, the small-bias conductance density increases with decreasing diameter. Theoretical calculations suggest that this effect arises because electron-hole recombination in the depletion region is the dominant charge transport mechanism, with a diameter dependence of both the depletion width and the electron-hole recombination time. The recombination time is dominated by surface contributions and depends linearly on the nanowire diameter.

  11. Investigation on the charge collection properties of a 4H-SiC Schottky diode detector

    CERN Document Server

    Verzellesi, G; Nava, F; Canali, C

    2002-01-01

    We present experimental and theoretical data on the charge collection properties of a 4H-SiC epitaxial Schottky diode exposed to 5.48- and 2.00-MeV alpha particles. Hundred percent Charge Collection Efficiency (CCE) is, in particular, demonstrated for the 2.00-MeV alpha particles at reverse voltages higher than 40 V. By comparing measured CCE values with the outcomes of drift-diffusion simulations, a value of 500 ns is inferred for the hole lifetime within the lowly doped, active layer of virgin samples. The contributions of diffusion and funneling-assisted drift to CCE at low reverse voltages are pointed out.

  12. Photovoltaic characterization of graphene/silicon Schottky junctions from local and macroscopic perspectives

    Czech Academy of Sciences Publication Activity Database

    Hájková, Zdeňka; Ledinský, Martin; Vetushka, Aliaksi; Stuchlík, Jiří; Müller, Martin; Fejfar, Antonín; Bouša, Milan; Kalbáč, Martin; Frank, Otakar

    2017-01-01

    Roč. 676, May (2017), s. 82-88 ISSN 0009-2614 R&D Projects: GA ČR GA14-15357S Institutional support: RVO:68378271 ; RVO:61388955 Keywords : CVD graphene * microcrystalline silicon * solar cells * Schottky junctions * current-voltage curves * C-AFM Subject RIV: BM - Solid Matter Physics ; Magnetism; CG - Electrochemistry (UFCH-W) OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.); Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis) (UFCH-W) Impact factor: 1.815, year: 2016

  13. Schottky barrier enhancement on n-InP solar cell applications

    DEFF Research Database (Denmark)

    Clausen, Thomas; Leistiko, Otto

    1994-01-01

    It is demonstrated that the Schottky barrier height on n-type InP can be enhanced to values close to the energy bandgap (1.35 eV) by employing a AuZnCr metallization. The process is simple and requires only mild and fast annealing sequences with temperatures not exceeding 500°C. Also, no critical...... epitaxial growth step of junctions is needed, making the process fairly cheap. Thus, prospects for an efficient and simple solar cell device structure for space application purposes based on highly radiant-resistant InP are greatly improved...

  14. High performance trench MOS barrier Schottky diode with high-k gate oxide

    Science.gov (United States)

    Zhai, Dong-Yuan; Zhu, Jun; Zhao, Yi; Cai, Yin-Fei; Shi, Yi; Zheng, You-Liao

    2015-07-01

    A novel trench MOS barrier Schottky diode (TMBS) device with a high-k material introduced into the gate insulator is reported, which is named high-k TMBS. By simulation with Medici, it is found that the high-k TMBS can have 19.8% lower leakage current while maintaining the same breakdown voltage and forward turn-on voltage compared with the conventional regular trench TMBS. Project supported by the National Basic Research Program of China (Grant No. 2011CBA00607), the National Natural Science Foundation of China (Grant Nos. 61106089 and 61376097), and the Zhejiang Provincial Natural Science Foundation of China (Grant No. LR14F040001).

  15. Determination of the Schottky barrier height of ferromagnetic contacts to few-layer phosphorene

    Energy Technology Data Exchange (ETDEWEB)

    Anugrah, Yoska; Robbins, Matthew C.; Koester, Steven J. [Department of Electrical and Computer Engineering, University of Minnesota-Twin Cities, Minneapolis, Minnesota 55455 (United States); Crowell, Paul A. [School of Physics and Astronomy, University of Minnesota-Twin Cities, Minneapolis, Minnesota 55455 (United States)

    2015-03-09

    Phosphorene, the 2D analogue of black phosphorus, is a promising material for studying spin transport due to its low spin-orbit coupling and its ½ nuclear spin, which could allow the study of hyperfine effects. In this work, the properties of permalloy (Py) and cobalt (Co) contacts to few-layer phosphorene are presented. The Schottky barrier height was extracted and determined as a function of gate bias. Flat-band barrier heights, relative to the valence band edge, of 110 meV and 200 meV were determined for Py and Co, respectively. These results are important for future studies of spin transport in phosphorene.

  16. Room temperature electrically tunable rectification magnetoresistance in Ge-based Schottky devices.

    Science.gov (United States)

    Huang, Qi-Kun; Yan, Yi; Zhang, Kun; Li, Huan-Huan; Kang, Shishou; Tian, Yu-Feng

    2016-11-23

    Electrical control of magnetotransport properties is crucial for device applications in the field of spintronics. In this work, as an extension of our previous observation of rectification magnetoresistance, an innovative technique for electrical control of rectification magnetoresistance has been developed by applying direct current and alternating current simultaneously to the Ge-based Schottky devices, where the rectification magnetoresistance could be remarkably tuned in a wide range. Moreover, the interface and bulk contribution to the magnetotransport properties has been effectively separated based on the rectification magnetoresistance effect. The state-of-the-art electrical manipulation technique could be adapt to other similar heterojunctions, where fascinating rectification magnetoresistance is worthy of expectation.

  17. Microwave Schottky diagnostic systems for the Fermilab Tevatron, Recycler, and CERN Large Hadron Collider

    Directory of Open Access Journals (Sweden)

    Ralph J. Pasquinelli

    2011-07-01

    Full Text Available A means for noninvasive measurement of transverse and longitudinal characteristics of bunched beams in synchrotrons has been developed based on high sensitivity slotted waveguide pickups. The pickups allow for bandwidths exceeding hundreds of MHz while maintaining good beam sensitivity characteristics. Wide bandwidth is essential to allow bunch-by-bunch measurements by means of a fast gate. The Schottky detector system is installed and successfully commissioned in the Fermilab Tevatron, Recycler and CERN LHC synchrotrons. Measurement capabilities include tune, chromaticity, and momentum spread of single or multiple beam bunches in any combination. With appropriate calibrations, emittance can also be measured by integrating the area under the incoherent tune sidebands.

  18. Anomalous Schottky specific heat and structural distortion in ferromagnetic PrAl2.

    Science.gov (United States)

    Pathak, Arjun K; Paudyal, D; Mudryk, Y; Gschneidner, K A; Pecharsky, V K

    2013-05-03

    Unique from other rare earth dialuminides, PrAl(2) undergoes a cubic to tetragonal distortion below T = 30 K in a zero magnetic field, but the system recovers its cubic symmetry upon the application of an external magnetic field of 10 kOe via a lifting of the 4f crystal field splitting. The nuclear Schottky specific heat in PrAl(2) is anomalously high compared to that of pure Pr metal. First principles calculations reveal that the 4f crystal field splitting in the tetragonally distorted phase of PrAl(2) underpins the observed unusual low temperature phenomena.

  19. Enhanced Thermionic Emission and Low 1/f Noise in Exfoliated Graphene/GaN Schottky Barrier Diode.

    Science.gov (United States)

    Kumar, Ashutosh; Kashid, Ranjit; Ghosh, Arindam; Kumar, Vikram; Singh, Rajendra

    2016-03-01

    Temperature-dependent electrical transport characteristics of exfoliated graphene/GaN Schottky diodes are investigated and compared with conventional Ni/GaN Schottky diodes. The ideality factor of graphene/GaN and Ni/GaN diodes are measured to be 1.33 and 1.51, respectively, which is suggestive of comparatively higher thermionic emission current in graphene/GaN diode. The barrier height values for graphene/GaN diode obtained using thermionic emission model and Richardson plots are found to be 0.60 and 0.72 eV, respectively, which are higher than predicted barrier height ∼0.40 eV as per the Schottky-Mott model. The higher barrier height is attributed to hole doping of graphene due to graphene-Au interaction which shifts the Fermi level in graphene by ∼0.3 eV. The magnitude of flicker noise of graphene/GaN Schottky diode increases up to 175 K followed by its decrease at higher temperatures. This indicates that diffusion currents and barrier inhomogeneities dominate the electronic transport at lower and higher temperatures, respectively. The exfoliated graphene/GaN diode is found to have lower level of barrier inhomogeneities than conventional Ni/GaN diode, as well as earlier reported graphene/GaN diode fabricated using chemical vapor deposited graphene. The lesser barrier inhomogeneities in graphene/GaN diode results in lower flicker noise by 2 orders of magnitude as compared to Ni/GaN diode. Enhanced thermionic emission current, lower level of inhomogeneities, and reduced flicker noise suggests that graphene-GaN Schottky diodes may have the underlying trend for replacing metal-GaN Schottky diodes.

  20. Molecular beam epitaxial growth and structural characterization of ZnS on (001) GaAs

    Science.gov (United States)

    Benz, R. G., II; Huang, P. C.; Stock, S. R.; Summers, C. J.

    1988-01-01

    The effect of surface nucleation processes on the quality of ZnS layers grown on (001) GaAs substrates by molecular beam epitaxy is reported. Reflection high energy electron diffraction indicated that nucleation at high temperatures produced more planar surfaces than nucleation at low temperatures, but the crystalline quality as assessed by X-ray double crystal diffractometry is relatively independent of nucleation temperature. A critical factor in layer quality was the initial roughness of the GaAs surfaces.

  1. Basic mechanisms study for MIS solar cell structures on GaAs

    Science.gov (United States)

    Fonash, S. J.

    1978-01-01

    The solar cell structure examined is the MIS configuration on (n) GaAs. The metal room temperature oxide/(n) GaAs materials system was studied. Metals with electronegativities varying from 2.4 (Au) to 1.5 (Al) were used as the upper electrode. The thinnest metallization that did not interfere with the measurement techniques (by introducing essentially transmission line series resistance problems across a device) was used. Photovoltaic response was not optimized.

  2. Microhardness of epitaxial layers of GaAs doped with rare earths

    International Nuclear Information System (INIS)

    Kulish, U.M.; Gamidov, Z.S.; Kuznetsova, I.Yu.; Petkeeva, L.N.; Borlikova, G.V.

    1989-01-01

    Results of the study of microhardness of GaAS layer doped by certain rare earths - Gd, Tb, Dy - are presented. The assumption is made that the higher is the value of the first potential of rare earth impurity ionization (i.e. the higher is the filling of 4f-shell), the lower is the effect of the element on electric and mechanical properties of GaAs epitaxial layers

  3. Super-Lattice Light Emitting Diodes (SLEDS) on GaAs

    Science.gov (United States)

    2016-03-31

    material [5]. Even after wafer distributors began selling GaSb substrates, semi- insulating GaSb and InAs substrates were, and are, not available for MBE... driver circuits on the front side, and another where LED array wafers are wafer bonded with RIIC wafers. If a successful approach can be reached a...this work, we describe two alternative approaches where LED arrays are grown on the backside of GaAs substrates with prefabricated GaAs driver

  4. Capacitance-voltage measurements in GaAs thin-film epitaxial structures

    Directory of Open Access Journals (Sweden)

    Gorev N. B.

    2009-10-01

    Full Text Available It is shown that capacitance–voltage characteristics that feature steeply dropping regions, in particular those of GaAs thin-film structures, may be measured at moderately small amplitudes of the measuring ac voltage (of the order of 100 mV at the expense of taking measurements at two different amplitudes. This conclusion is confirmed by the results of numerical calculation of the apparent capacitance of GaAs epitaxial structures.

  5. Temperature and 8 MeV electron irradiation effects on GaAs solar cells

    Indian Academy of Sciences (India)

    GaAs solar cell parameters up to an electron dose of 100 kGy, exhibiting good tolerance for electrons of 8 MeV energy. Keywords. GaAs solar cell; temperature; electron irradiation; current–voltage charac- teristics; capacitance–frequency characteristics; efficiency. PACS Nos 29.25.Bx; 61.82.Fk; 82.47.Jk; 42.79.Ek. 1.

  6. Radiation and temperature effects in gallium arsenide, indium phosphide, and silicon solar cells

    Science.gov (United States)

    Weinberg, I.; Swartz, C. K.; Hart, R. E., Jr.; Statler, R. L.

    1987-01-01

    The effects of radiation on performance are determined for both n+p and p+n GaAs and InP cells and for silicon n+p cells. It is found that the radiation resistance of InP is greater than that of both GaAs and Si under 1-MeV electron irradiation. For silicon, the observed decreased radiation resistance with decreased resistivity is attributed to the presence of a radiation-induced boron-oxygen defect. Comparison of radiation damage in both p+n and n+p GaAs cells yields a decreased radiation resistance for the n+p cell attributable to increased series resistance, decreased shunt resistance, and relatively greater losses in the cell's p-region. For InP, the n+p configuration is found to have greater radiation resistance than the p+n cell. The increased loss in this latter cell is attributed to losses in the cell's emitter region. Temperature dependency results are interpreted using a theoretical relation for dVoc/dT, which predicts that increased Voc should result in decreased numerical values for dPm/dT. The predicted correlation is observed for GaAs but not for InP, a result which is attributed to variations in cell processing.

  7. Calculation of the Schottky barrier and current–voltage characteristics of metal–alloy structures based on silicon carbide

    Energy Technology Data Exchange (ETDEWEB)

    Altuhov, V. I., E-mail: altukhovv@mail.ru; Kasyanenko, I. S.; Sankin, A. V. [North Caucasian Federal University, Institute of Service, Tourism and Design (Branch) (Russian Federation); Bilalov, B. A. [Dagestan State Technical University (Russian Federation); Sigov, A. S. [Moscow State Technical University of Radio Engineering, Electronics, and Automation (Russian Federation)

    2016-09-15

    A simple but nonlinear model of the defect density at a metal–semiconductor interface, when a Schottky barrier is formed by surface defects states localized at the interface, is developed. It is shown that taking the nonlinear dependence of the Fermi level on the defect density into account leads to a Schottky barrier increase by 15–25%. The calculated barrier heights are used to analyze the current–voltage characteristics of n-M/p-(SiC){sub 1–x}(AlN){sub x} structures. The results of calculations are compared to experimental data.

  8. Evaluation of Polarization Effects of e(-) Collection Schottky CdTe Medipix3RX Hybrid Pixel Detector

    OpenAIRE

    Astromskas, V; Gimenez, EN; Lohstroh, A; Tartoni, N

    2016-01-01

    This paper focuses on the evaluation of operational conditions such as temperature, exposure time and flux on the polarization of a Schottky electron collection CdTe detector. A Schottky e- collection CdTe Medipix3RX hybrid pixel detector was developed as a part of the CALIPSO-HIZPAD2 EU project. The 128 ×128 pixel matrix and 0.75 mm thick CdTe sensor bump-bonded to Medipix3RX readout chips enabled the study of the polarization effects. Single and quad module Medipix3RX chips were used which ...

  9. A planar Al-Si Schottky barrier metal–oxide–semiconductor field effect transistor operated at cryogenic temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Purches, W. E. [School of Physics, UNSW, Sydney 2052 (Australia); Rossi, A.; Zhao, R. [School of Electrical Engineering and Telecommunications, UNSW, Sydney 2052 (Australia); Kafanov, S.; Duty, T. L. [School of Physics, UNSW, Sydney 2052 (Australia); Centre for Engineered Quantum Systems (EQuS), School of Physics, UNSW, Sydney 2052 (Australia); Dzurak, A. S. [School of Electrical Engineering and Telecommunications, UNSW, Sydney 2052 (Australia); Australian Centre of Excellence for Quantum Computation and Communication Technology (CQC2T), UNSW, Sydney 2052 (Australia); Rogge, S.; Tettamanzi, G. C., E-mail: g.tettamanzi@unsw.edu.au [School of Physics, UNSW, Sydney 2052 (Australia); Australian Centre of Excellence for Quantum Computation and Communication Technology (CQC2T), UNSW, Sydney 2052 (Australia)

    2015-08-10

    Schottky Barrier-MOSFET technology offers intriguing possibilities for cryogenic nano-scale devices, such as Si quantum devices and superconducting devices. We present experimental results on a device architecture where the gate electrode is self-aligned with the device channel and overlaps the source and drain electrodes. This facilitates a sub-5 nm gap between the source/drain and channel, and no spacers are required. At cryogenic temperatures, such devices function as p-MOS Tunnel FETs, as determined by the Schottky barrier at the Al-Si interface, and as a further advantage, fabrication processes are compatible with both CMOS and superconducting logic technology.

  10. Leakage current reduction of vertical GaN junction barrier Schottky diodes using dual-anode process

    Science.gov (United States)

    Hayashida, Tetsuro; Nanjo, Takuma; Furukawa, Akihiko; Watahiki, Tatsuro; Yamamuka, Mikio

    2018-04-01

    The origin of the leakage current of a trench-type vertical GaN diode was discussed. We found that the edge of p-GaN is the main leakage spot. To reduce the reverse leakage current at the edge of p-GaN, a dual-anode process was proposed. As a result, the reverse blocking voltage defined at the leakage current density of 1 mA/cm2 of a vertical GaN junction barrier Schottky (JBS) diode was improved from 780 to 1,190 V, which is the highest value ever reported for vertical GaN Schottky barrier diodes (SBDs).

  11. High quality superconducting NbN thin films on GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Marsili, Francesco; Fiore, Andrea [COBRA Research Institute, Eindhoven University of Technology, PO Box 513, NL-5600MB Eindhoven (Netherlands); Gaggero, Alessandro; Leoni, Roberto [Istituto di Fotonica e Nanotecnologie (IFN), CNR, via Cineto Romano 42, I-00156 Roma (Italy); Li, Lianhe H; Surrente, Alessandro [Institute of Photonics and Quantum Electronics (IPEQ), Ecole Polytechnique Federale de Lausanne (EPFL), Station 3, CH-1015 Lausanne (Switzerland); Levy, Francis, E-mail: francesco.marsili@epfl.c [Institute of Condensed Matter Physics (IPMC), Ecole Polytechnique Federale de Lausanne (EPFL), Station 3, CH-1015 Lausanne (Switzerland)

    2009-09-15

    A very promising way to increase the detection efficiency of nanowire superconducting single-photon detectors (SSPDs) consists in integrating them with advanced optical structures such as distributed Bragg reflectors (DBRs) and optical waveguides. This requires transferring the challenging SSPD technology from the usual substrates, i.e. sapphire and MgO, to an optical substrate like GaAs, on which DBRs and waveguides can be easily obtained. Therefore, we optimized the deposition process of few-nm thick superconducting NbN films on GaAs and AlAs/GaAs-based DBRs at low temperatures (substrate temperature T{sub S} = 400 {sup 0}C), in order to prevent As evaporation. NbN films ranging from 150 to 3 nm in thickness were then deposited on single-crystal MgO, GaAs, MgO-buffered GaAs and DBRs by current-controlled DC magnetron sputtering (planar, circular, balanced configuration) of Nb in an Ar+N{sub 2} plasma. 5.5 nm thick NbN films on GaAs exhibit T{sub C} = 10.7 K, {Delta}T{sub C} = 1.1 K and RRR = 0.7. The growth of such high quality thin NbN films on GaAs and DBRs has never been reported before.

  12. Epitaxial growth of Bi ultra-thin films on GaAs by electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Plaza, M. [Dpto. Fisica de Materiales, Universidad Complutense de Madrid, 28040 Madrid (Spain); Abuin, M. [Dpto. Fisica de Materiales, Universidad Complutense de Madrid, 28040 Madrid (Spain); Unidad Asociada IQFR(CSIC)-UCM, Madrid 28040 (Spain); Mascaraque, A., E-mail: arantzazu.mascaraque@fis.ucm.es [Dpto. Fisica de Materiales, Universidad Complutense de Madrid, 28040 Madrid (Spain); Unidad Asociada IQFR(CSIC)-UCM, Madrid 28040 (Spain); Gonzalez-Barrio, M.A. [Dpto. Fisica de Materiales, Universidad Complutense de Madrid, 28040 Madrid (Spain); Unidad Asociada IQFR(CSIC)-UCM, Madrid 28040 (Spain); Perez, L. [Dpto. Fisica de Materiales, Universidad Complutense de Madrid, 28040 Madrid (Spain); Instituto de Sistemas Optoelectronicos y Microtecnologia, Universidad Politecnica de Madrid, 28040 Madrid (Spain)

    2012-05-15

    Highlights: Black-Right-Pointing-Pointer Electrodeposition of Bi films on GaAs substrates with different orientations. Black-Right-Pointing-Pointer Ultra thin films - 50 nm - are continuous and smooth. Black-Right-Pointing-Pointer Bi always grows with (0 1 L) orientations. Black-Right-Pointing-Pointer Epitaxial growth onto As terminated surfaces. Black-Right-Pointing-Pointer Proposed model based on structural and chemical considerations. - Abstract: We report on the growth of thin bismuth films on GaAs substrates with different orientations by means of electrochemical deposition. Atomic force microscopy reveals that the films are continuous and exhibit low roughness when they are grown under the appropriate overpotential. {omega}-2{theta} X-ray diffraction scans only show reflections that can be indexed as (0 1 L), meaning that Bi grows onto GaAs only in combinations of the (0 0 1) and (0 1 0) orientations. The matching between the GaAs substrate and the Bi layer has been studied by asymmetric X-ray scans, finding that Bi grows epitaxially on GaAs(1 1 0) and GaAs(1 1 1)B, both As-terminated surfaces. We explain these results by structural and chemical considerations.

  13. Structural Evolution During Formation and Filling of Self-patterned Nanoholes on GaAs (100 Surfaces

    Directory of Open Access Journals (Sweden)

    Zhou Lin

    2008-01-01

    Full Text Available Abstract Nanohole formation on an AlAs/GaAs superlattice gives insight to both the “drilling” effect of Ga droplets on AlAs as compared to GaAs and the hole-filling process. The shape and depth of the nanoholes formed on GaAs (100 substrates has been studied by the cross-section transmission electron microscopy. The Ga droplets “drill” through the AlAs layer at a much slower rate than through GaAs due to differences in activation energy. Refill of the nanohole results in elongated GaAs mounds along the [01−1] direction. As a result of capillarity-induced diffusion, GaAs favors growth inside the nanoholes, which provides the possibility to fabricate GaAs and AlAs nanostructures.

  14. Coherent radiation spectrum measurements at KEK LUCX facility

    Energy Technology Data Exchange (ETDEWEB)

    Shevelev, M., E-mail: mishe@post.kek.jp [KEK: High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan); Aryshev, A., E-mail: alar@post.kek.jp [KEK: High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan); Araki, S.; Fukuda, M. [KEK: High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan); Karataev, P. [John Adams Institute at Royal Holloway, University of London, Egham, Surrey TW20 0EX (United Kingdom); Terunuma, N.; Urakawa, J. [KEK: High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan)

    2015-01-21

    This paper demonstrates the detailed design concept, alignment, and initial testing of a Michelson interferometer for the THz spectral range. We present the first results on the measurement of a coherent transition radiation spectrum and describe the performance of a pair of ultra-fast broadband room temperature Schottky barrier diode detectors. We discuss the main criteria of interferometer beam splitter optimization, the alignment technique, the high-precision calibration and linearity check of the motion system.

  15. Temperature Insensitive and Radiation Hard Photonics

    Science.gov (United States)

    2014-03-19

    Three Dimension 60Co Radioactive cobalt, isotope 60 AFM Atomic Force Microscope AlGaAs Aluminum Gallium Arsenide AlN Aluminum Nitride AR Anti...Release; distribution is unlimited. 2 orbiter employed a series of radiation-sensitive elements with aluminum shielding varying from less than 1-mm...Reflection DC Direct Current DWELL Dots-in-a-Well GaAs Gallium Arsenide GEO Geosynchronous Earth Orbit GPIB General Purpose Interface Bus GSAT-2 Name of

  16. Tuning the Schottky Barrier at the Graphene/MoS2 Interface by Electron Doping

    DEFF Research Database (Denmark)

    Jin, Chengjun; Rasmussen, Filip Anselm; Thygesen, Kristian Sommer

    2015-01-01

    Using ab initio calculations we investigate the energy level alignment at the graphene/MoS2 heterostructure and the use of electron doping as a strategy to lower the Schottky barrier and achieve a low-resistance Ohmic contact. For the neutral heterostructure, density functional theory (DFT......) with a generalized gradient approximation predicts a Schottky barrier height of 0.18 eV, whereas the G0W0 method increases this value to 0.60 eV. While the DFT band gap of MoS2 does not change when the heterostructure is formed, the G0W0 gap is reduced by 0.30 eV as a result of the enhanced screening by the graphene...... layer. In contrast to the case of metal substrates, where the band alignment is governed by Pauli repulsion-induced interface dipoles, the graphene/MoS2 heterostructure shows only a negligible interface dipole. As a consequence, the band alignment at the neutral heterostructure is not changed when...

  17. Electrical Characterization of High Energy Electron Irradiated Ni/4 H-SiC Schottky Barrier Diodes

    Science.gov (United States)

    Paradzah, A. T.; Omotoso, E.; Legodi, M. J.; Auret, F. D.; Meyer, W. E.; Diale, M.

    2016-08-01

    The effect of high energy electron irradiation on Ni/4 H-SiC Schottky barrier diodes was evaluated by current-voltage ( I- V) and capacitance-voltage ( C- V) measurements at room temperature. Electron irradiation was achieved by using a radioactive strontium source with peak emission energy of 2.3 MeV. Irradiation was performed in fluence steps of 4.9 × 1013 cm-2 until a total fluence of 5.4 × 1014 cm-2 was reached. The Schottky barrier height determined from I- V measurements was not significantly changed by irradiation while that obtained from C- V measurements increased with irradiation. The ideality factor was obtained before irradiation as 1.05 and this value did not significantly change as a result of irradiation. The series resistance increased from 47 Ω before irradiation to 74 Ω after a total electron fluence of 5.4 × 1014 cm-2. The net donor concentration decreased with increasing irradiation fluence from 4.6 × 1014 cm-3 to 3.0 × 1014 cm-3 from which the carrier removal rate was calculated to be 0.37 cm-1.

  18. Direct-current triboelectricity generation by a sliding Schottky nanocontact on MoS2 multilayers

    Science.gov (United States)

    Liu, Jun; Goswami, Ankur; Jiang, Keren; Khan, Faheem; Kim, Seokbeom; McGee, Ryan; Li, Zhi; Hu, Zhiyu; Lee, Jungchul; Thundat, Thomas

    2018-02-01

    The direct conversion of mechanical energy into electricity by nanomaterial-based devices offers potential for green energy harvesting1-3. A conventional triboelectric nanogenerator converts frictional energy into electricity by producing alternating current (a.c.) triboelectricity. However, this approach is limited by low current density and the need for rectification2. Here, we show that continuous direct-current (d.c.) with a maximum density of 106 A m-2 can be directly generated by a sliding Schottky nanocontact without the application of an external voltage. We demonstrate this by sliding a conductive-atomic force microscope tip on a thin film of molybdenum disulfide (MoS2). Finite element simulation reveals that the anomalously high current density can be attributed to the non-equilibrium carrier transport phenomenon enhanced by the strong local electrical field (105-106 V m-2) at the conductive nanoscale tip4. We hypothesize that the charge transport may be induced by electronic excitation under friction, and the nanoscale current-voltage spectra analysis indicates that the rectifying Schottky barrier at the tip-sample interface plays a critical role in efficient d.c. energy harvesting. This concept is scalable when combined with microfabricated or contact surface modified electrodes, which makes it promising for efficient d.c. triboelectricity generation.

  19. Novel field-effect schottky barrier transistors based on graphene-MoS 2 heterojunctions

    KAUST Repository

    Tian, He

    2014-08-11

    Recently, two-dimensional materials such as molybdenum disulphide (MoS 2) have been demonstrated to realize field effect transistors (FET) with a large current on-off ratio. However, the carrier mobility in backgate MoS2 FET is rather low (typically 0.5-20 cm2/V.s). Here, we report a novel field-effect Schottky barrier transistors (FESBT) based on graphene-MoS2 heterojunction (GMH), where the characteristics of high mobility from graphene and high on-off ratio from MoS2 are properly balanced in the novel transistors. Large modulation on the device current (on/off ratio of 105) is achieved by adjusting the backgate (through 300 nm SiO2) voltage to modulate the graphene-MoS2 Schottky barrier. Moreover, the field effective mobility of the FESBT is up to 58.7 cm2/V.s. Our theoretical analysis shows that if the thickness of oxide is further reduced, a subthreshold swing (SS) of 40 mV/decade can be maintained within three orders of drain current at room temperature. This provides an opportunity to overcome the limitation of 60 mV/decade for conventional CMOS devices. The FESBT implemented with a high on-off ratio, a relatively high mobility and a low subthreshold promises low-voltage and low-power applications for future electronics.

  20. The theory of Schottky spectra of ordered ion beams in a storage ring

    International Nuclear Information System (INIS)

    Avilov, V.V.; Hofmann, I.

    1991-12-01

    The longitudinal Schottky spectrum of an ultra-cold ion beam in a storage ring is calculated in the frame of harmonic oscillations of a 1d Coulomb lattice. It is assumed that the extremely high cooling rate required to bring the beam into a one-dimensional ordered chain can be provided by electron or laser cooling. The anharmonic transversal oscillations with temperature much higher then the longitudinal one are taken into account within the self-consistent phonon approximation. The Schottky spectrum measured by the pick-up system consists of bands located near the harmonics of the revolution frequency of the beam. The total intensity of each band characterizes the temperature distribution of the phonons in an ionic chain. The amplitude and the width of the peaks in the spectrum are a function of the strength of relaxation processes (cooling and heating) as well as the Coulomb correlations, rsp. ordering. It is suggested that a careful analysis of these spectra could be a signature of the presence of 1d ordering in the beam. (orig.)

  1. Broadband photodetector based on carbon nanotube thin film/single layer graphene Schottky junction

    Science.gov (United States)

    Zhang, Teng-Fei; Li, Zhi-Peng; Wang, Jiu-Zhen; Kong, Wei-Yu; Wu, Guo-An; Zheng, Yu-Zhen; Zhao, Yuan-Wei; Yao, En-Xu; Zhuang, Nai-Xi; Luo, Lin-Bao

    2016-12-01

    In this study, we present a broadband nano-photodetector based on single-layer graphene (SLG)-carbon nanotube thin film (CNTF) Schottky junction. It was found that the as-fabricated device exhibited obvious sensitivity to a wide range of illumination, with peak sensitivity at 600 and 920 nm. In addition, the SLG-CNTF device had a fast response speed (τr = 68 μs, τf = 78 μs) and good reproducibility in a wide range of switching frequencies (50-5400 Hz). The on-off ratio, responsivity, and detectivity of the device were estimated to be 1 × 102, 209 mAW-1 and 4.87 × 1010 cm Hz1/2 W-1, respectively. What is more, other device parameters including linear performance θ and linear dynamic range (LDR) were calculated to be 0.99 and 58.8 dB, respectively, which were relatively better than other carbon nanotube based devices. The totality of the above study signifies that the present SLG-CNTF Schottky junction broadband nano-photodetector may have promising application in future nano-optoelectronic devices and systems.

  2. Temperature-dependent Schottky barrier in high-performance organic solar cells

    Science.gov (United States)

    Li, Hui; He, Dan; Zhou, Qing; Mao, Peng; Cao, Jiamin; Ding, Liming; Wang, Jizheng

    2017-01-01

    Organic solar cells (OSCs) have attracted great attention in the past 30 years, and the power conversion efficiency (PCE) now reaches around 10%, largely owning to the rapid material developments. Meanwhile with the progress in the device performance, more and more interests are turning to understanding the fundamental physics inside the OSCs. In the conventional bulk-heterojunction architecture, only recently it is realized that the blend/cathode Schottky junction serves as the fundamental diode for the photovoltaic function. However, few researches have focused on such junctions, and their physical properties are far from being well-understood. In this paper based on PThBDTP:PC71BM blend, we fabricated OSCs with PCE exceeding 10%, and investigated temperature-dependent behaviors of the junction diodes by various characterization including current-voltage, capacitance-voltage and impedance measurements between 70 to 290 K. We found the Schottky barrier height exhibits large inhomogeneity, which can be described by two sets of Gaussian distributions. PMID:28071700

  3. Compact Surface Plasmon Resonance System with Au/Si Schottky Barrier.

    Science.gov (United States)

    Tsukagoshi, Takuya; Kuroda, Yuta; Noda, Kentaro; Binh-Khiem, Nguyen; Kan, Tetsuo; Shimoyama, Isao

    2018-01-30

    Ethanol concentration was quantified by the use of a compact surface plasmon resonance (SPR) system, which electrically detects hot electrons via a Schottky barrier. Although it is well known that SPR can be used as bio/chemical sensors, implementation is not necessarily practical, due to the size and cost impediments associated with a system with variable wavelength or angle of incidence. However, scanning capability is not a prerequisite if the objective is to use SPR in a sensor. It is possible to build a small, inexpensive SPR sensor if the optics have no moving parts and a Schottky barrier is used for electrical current detection in place of a photodetector. This article reports on the design and performance of such a novel SPR sensor, and its application for quantifying ethanol concentration. As the concentration of ethanol is increased, the change in the angle dependence of the SPR current is observed. This change can be understood as a superposition of contributions of SPR coupled with the +3rd- and -3rd-order diffraction. Moreover, real-time monitoring of ethanol concentration was demonstrated using the proposed SPR system.

  4. Polycrystalline silicon carbide dopant profiles obtained through a scanning nano-Schottky contact

    Energy Technology Data Exchange (ETDEWEB)

    Golt, M. C.; Strawhecker, K. E.; Bratcher, M. S. [U.S. Army Research Laboratory, WMRD, Aberdeen Proving Ground, Maryland 21005 (United States); Shanholtz, E. R. [ORISE, Belcamp, Maryland 21017 (United States)

    2016-07-14

    The unique thermo-electro-mechanical properties of polycrystalline silicon carbide (poly-SiC) make it a desirable candidate for structural and electronic materials for operation in extreme environments. Necessitated by the need to understand how processing additives influence poly-SiC structure and electrical properties, the distribution of lattice defects and impurities across a specimen of hot-pressed 6H poly-SiC processed with p-type additives was visualized with high spatial resolution using a conductive atomic force microscopy approach in which a contact forming a nano-Schottky interface is scanned across the sample. The results reveal very intricate structures within poly-SiC, with each grain having a complex core-rim structure. This complexity results from the influence the additives have on the evolution of the microstructure during processing. It was found that the highest conductivities localized at rims as well as at the interface between the rim and the core. The conductivity of the cores is less than the conductivity of the rims due to a lower concentration of dopant. Analysis of the observed conductivities and current-voltage curves is presented in the context of nano-Schottky contact regimes where the conventional understanding of charge transport to diode operation is no longer valid.

  5. X-ray detection with zinc-blende (cubic) GaN Schottky diodes.

    Science.gov (United States)

    Gohil, T; Whale, J; Lioliou, G; Novikov, S V; Foxon, C T; Kent, A J; Barnett, A M

    2016-07-12

    The room temperature X-ray responses as functions of time of two n type cubic GaN Schottky diodes (200 μm and 400 μm diameters) are reported. The current densities as functions of time for both diodes showed fast turn-on transients and increases in current density when illuminated with X-ray photons of energy up to 35 keV. The diodes were also electrically characterized: capacitance, implied depletion width and dark current measurements as functions of applied bias at room temperature are presented. At -5 V reverse bias, the capacitances of the diodes were measured to be (84.05 ± 0.01) pF and (121.67 ± 0.02) pF, respectively. At -5 V reverse bias, the dark current densities of the diodes were measured to be (347.2 ± 0.4) mA cm(-2) and (189.0 ± 0.2) mA cm(-2), respectively. The Schottky barrier heights of the devices (0.52 ± 0.07) eV and (0.63 ± 0.09) eV, respectively, were extracted from the forward dark current characteristics.

  6. Characterization and Modeling of Schottky Diodes Based on Bulk GaN Unintentionally Doped

    Directory of Open Access Journals (Sweden)

    R. KHELIFI

    2014-05-01

    Full Text Available In this paper, we have studied Au/n-GaN Schottky diodes. The substrates are realized on bulk GaN. The current-voltage (I-V and capacitance–voltage (C–V of Au/n-GaN structures were investigated at room temperature. The electrical parameters such as saturation current I0 (1.98 ´ 10-7 A, ideality factor n (1.02, barrier height fbn (0.65 eV and series resistance Rs (84 W were evaluated from I–V experimental data. The characteristics in these data structures Schottky Au/n-GaN can help to highlight the main conduction mechanisms observed. In addition to the thermionic current present in our structures, the leakage current intervenes too. The barrier height and doping determined from the (C-V characteristic are of the order of 1.17 eV and 8.16 ´ 1016 cm-3, respectively. The average density of surface states Nss determined set to 1.09 ´ 1012 eV-1 cm-2.

  7. Current Transport Mechanisms and Capacitance Characteristic in the InN/InP Schottky Structures

    Directory of Open Access Journals (Sweden)

    K. AMEUR

    2014-05-01

    Full Text Available In this work, electrical characterization of the current-voltage and capacitance- voltage curves for the Metal/InN/InP Schottky structures are investigated. We have studied electrically thin InN films realized by the nitridation of InP (100 substrates using a Glow Discharge Source (GDS in ultra high vacuum. The I (V curves have exhibited anomalous two-step (kink forward bias behaviour; a suitable fit was only obtained by using a model of two discrete diodes in parallel. Thus, we have calculated, using I(V and C(V curves of Hg/InN/InP Schottky structures, the ideality factor n, the saturation current Is, the barrier height jB, the series resistance Rs, the doping concentration Nd and the diffusion voltage Vd. We have also presented the band diagram of this heterojunction which indicates the presence of a channel formed by holes at the interface InN/InP which explain by the presence of two-dimensional electron gas (2-DEG and this was noticed in the presentation of characteristics C(V.

  8. Tunable Schottky diodes fabricated from electrospun crossed SnO2/PEDOT-PSSA nanoribbons

    Science.gov (United States)

    Carrasquillo, Katherine; Pinto, Nicholas

    2011-03-01

    Hardware in most solid state devices contains at least one interface between a p -type and an n -type semiconductor. Such hetero-junctions are typically fabricated from all inorganic Si based materials. In the past two decades however, devices fabricated from organic-inorganic semiconductors that are not Si based, or from all organic semiconductors have been the focus of much research. Semiconducting n -doped metal oxides are also attractive for use in devices and of particular interest is tin oxide (Sn O2) as it is stable in air and is optically transparent with a band gap of ~ 3.4 eV. The p -doped conducting polymer PEDOT-PSSA is also stable in air and is widely used in flexible devices. We shall report on the electrospinning technique to fabricate in air Schottky diodes, by simply crossing n -doped Sn O2 and p -doped PEDOT-PSSA nanoribbons. The device parameters could be tuned by a back gate bias and by shining UV light. The diode parameters were calculated using the standard thermionic emission model of a Schottky and was tested as a half wave rectifier. NSF-RUI and NSF-PREM.

  9. Modeling of 4H—SiC multi-floating-junction Schottky barrier diode

    International Nuclear Information System (INIS)

    Hong-Bin, Pu; Lin, Cao; Zhi-Ming, Chen; Jie, Ren; Ya-Gong, Nan

    2010-01-01

    This paper develops a new and easy to implement analytical model for the specific on-resistance and electric field distribution along the critical path for 4H—SiC multi-floating junction Schottky barrier diode. Considering the charge compensation effects by the multilayer of buried opposite doped regions, it improves the breakdown voltage a lot in comparison with conventional one with the same on-resistance. The forward resistance of the floating junction Schottky barrier diode consists of several components and the electric field can be understood with superposition concept, both are consistent with MEDICI simulation results. Moreover, device parameters are optimized and the analyses show that in comparison with one layer floating junction, multilayer of floating junction layer is an effective way to increase the device performance when specific resistance and the breakdown voltage are traded off. The results show that the specific resistance increases 3.2 mΩ·cm 2 and breakdown voltage increases 422 V with an additional floating junction for the given structure. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  10. Investigation of temperature dependent barrier height of Au/ZnO/Si schottky diodes

    International Nuclear Information System (INIS)

    Asghar, M.; Mahmood, K.; Rabia, S.; BM, S.; Shahid, M. Y.; Hasan, M. A.

    2013-01-01

    In this study, temperature dependent current-voltage (I-V) measurements have been performed to investigate the inhomogeneity in the temperature dependent barrier heights of Au/ZnO/Si Schottky barrier diode in the temperature range 150 - 400K. The room temperature values for ideality factor and barrier height were found to be 2.9 and 0.60 eV respectively indicating the inhomogenity in the barrier heights of grown samples. The Richardson plot and ideality factor verses barrier height graph were also drawn to verified the discontinuity between Au and ZnO. This barrier height inhomogenity was explained by applying Gaussian distribution model. The extrapolation of the linear Fap (n) plot to n= 1 has given a homogeneous barrier height of approximately 1.1 eV. Fap versus 1/T plot was drawn to obtain the values of mean barrier height for Au/ZnO/Si Schottky diode (1.1 eV) and standard deviation(ds) (0.02 V) at zero bais. (author)

  11. Investigation of temperature dependent barrier height of Au/ZnO/Si schottky diodes

    International Nuclear Information System (INIS)

    Asghar, M; Mahmood, K; Rabia, S; M, Samaa B; Shahid, M Y; Hasan, M A

    2014-01-01

    In this study, temperature dependent current-voltage (I-V) measurements have been performed to investigate the inhomogeneity in the temperature dependent barrier heights of Au/ZnO/Si Schottky barrier diode in the temperature range 150 – 400K. The room temperature values for ideality factor and barrier height were found to be 2.9 and 0.60 eV respectively indicating the inhomogenity in the barrier heights of grown samples. The Richardson plot and ideality factor verses barrier height graph were also drawn to verified the discontinuity between Au and ZnO. This barrier height inhomogenity was explained by applying Gaussian distribution model. The extrapolation of the linear Φ ap (n) plot to n= 1 has given a homogeneous barrier height of approximately 1.1 eV. Φ ap versus 1/T plot was drawn to obtain the values of mean barrier height for Au/ZnO/Si Schottky diode (1.1 eV) and standard deviation(δ s ) (0.02 V) at zero bais

  12. Polycrystalline silicon carbide dopant profiles obtained through a scanning nano-Schottky contact

    International Nuclear Information System (INIS)

    Golt, M. C.; Strawhecker, K. E.; Bratcher, M. S.; Shanholtz, E. R.

    2016-01-01

    The unique thermo-electro-mechanical properties of polycrystalline silicon carbide (poly-SiC) make it a desirable candidate for structural and electronic materials for operation in extreme environments. Necessitated by the need to understand how processing additives influence poly-SiC structure and electrical properties, the distribution of lattice defects and impurities across a specimen of hot-pressed 6H poly-SiC processed with p-type additives was visualized with high spatial resolution using a conductive atomic force microscopy approach in which a contact forming a nano-Schottky interface is scanned across the sample. The results reveal very intricate structures within poly-SiC, with each grain having a complex core-rim structure. This complexity results from the influence the additives have on the evolution of the microstructure during processing. It was found that the highest conductivities localized at rims as well as at the interface between the rim and the core. The conductivity of the cores is less than the conductivity of the rims due to a lower concentration of dopant. Analysis of the observed conductivities and current-voltage curves is presented in the context of nano-Schottky contact regimes where the conventional understanding of charge transport to diode operation is no longer valid.

  13. High-temperature Schottky diode characteristics of bulk ZnO

    International Nuclear Information System (INIS)

    Guer, Emre; Tuezemen, S; Kilic, Bayram; Coskun, C

    2007-01-01

    Current-voltage (I-V) measurements of Ag/n-ZnO have been carried out at temperatures of 200-500 K in order to understand the temperature dependence of the diode characteristics. Forward-bias I-V analysis results in a Schottky barrier height of 0.82 eV and an ideality factor of 1.55 at room temperature. The barrier height of 0.74 eV and Richardson constant of 0.248 A K -2 cm -2 were also calculated from the Richardson plot, which shows nearly linear characteristics in the temperature range 240-440 K. From the nk b T/q versus k b T/q graph, where n is ideality factor, k b the Boltzmann constant, T the temperature and q the electronic charge we deduce that thermionic field emission (TFE) is dominant in the charge transport mechanism. At higher sample temperatures (>440 K), a trap-assisted tunnelling mechanism is proposed due to the existence of a deep donor situated at E c -0.62 eV with 3.3 x 10 -15 cm 2 capture cross section observed by both deep-level transient spectroscopy (DLTS) and lnI 0 versus 1/k b T plots. The ideality factor almost remains constant in the temperature range 240-400 K, which shows the stability of the Schottky contact in this temperature range

  14. Measurements of femtosecond pulse temporal profile by means of a Michelson interferometer with a Schottky junction.

    Science.gov (United States)

    Ling, Yan; Lu, Fang

    2006-12-20

    We introduce a new method for femtosecond pulse shape measurement. The interference of two pulses is employed rather than the second-harmonic generation (SHG). Usually, the measurements of the femtosecond pulse is realized by an interferometer in combination with a nonlinear optical material, while the measurement that we describe is realized by means of a Michelson interferometer with a Schottky junction. Only a metal-semiconductor junction (Schottky junction) is needed, and neither the nonlinear optical material nor a photodetector is included. The two-photon absorption arises when the light is strong enough, while there is only a one-photon absorption when the light is weak. And the calculations are in good agreement with the experimental results. In principle, the new technique could be used for the measuring of pulses with any duration and with very low power. Unlike the SHG scheme, in the new method the quality of optics, mechanics, and other elements of the scheme are not essential, and the measurement is easily realized, but the results are quite precise and very sensitive to the light.

  15. Hot carrier multiplication on graphene/TiO2 Schottky nanodiodes.

    Science.gov (United States)

    Lee, Young Keun; Choi, Hongkyw; Lee, Hyunsoo; Lee, Changhwan; Choi, Jin Sik; Choi, Choon-Gi; Hwang, Euyheon; Park, Jeong Young

    2016-06-08

    Carrier multiplication (i.e. generation of multiple electron-hole pairs from a single high-energy electron, CM) in graphene has been extensively studied both theoretically and experimentally, but direct application of hot carrier multiplication in graphene has not been reported. Here, taking advantage of efficient CM in graphene, we fabricated graphene/TiO2 Schottky nanodiodes and found CM-driven enhancement of quantum efficiency. The unusual photocurrent behavior was observed and directly compared with Fowler's law for photoemission on metals. The Fowler's law exponent for the graphene-based nanodiode is almost twice that of a thin gold film based diode; the graphene-based nanodiode also has a weak dependence on light intensity-both are significant evidence for CM in graphene. Furthermore, doping in graphene significantly modifies the quantum efficiency by changing the Schottky barrier. The CM phenomenon observed on the graphene/TiO2 nanodiodes can lead to intriguing applications of viable graphene-based light harvesting.

  16. Characterization of plasma etching damage on p-type GaN using Schottky diodes

    International Nuclear Information System (INIS)

    Kato, M.; Mikamo, K.; Ichimura, M.; Kanechika, M.; Ishiguro, O.; Kachi, T.

    2008-01-01

    The plasma etching damage in p-type GaN has been characterized. From current-voltage and capacitance-voltage characteristics of Schottky diodes, it was revealed that inductively coupled plasma (ICP) etching causes an increase in series resistance of the Schottky diodes and compensation of acceptors in p-type GaN. We investigated deep levels near the valence band of p-type GaN using current deep level transient spectroscopy (DLTS), and no deep level originating from the ICP etching damage was observed. On the other hand, by capacitance DLTS measurements for n-type GaN, we observed an increase in concentration of a donor-type defect with an activation energy of 0.25 eV after the ICP etching. The origin of this defect would be due to nitrogen vacancies. We also observed this defect by photocapacitance measurements for ICP-etched p-type GaN. For both n- and p-type GaN, we found that the low bias power ICP etching is effective to reduce the concentration of this defect introduced by the high bias power ICP etching

  17. Schottky junctions on perovskite single crystals: light-modulated dielectric constant and self-biased photodetection

    KAUST Repository

    Shaikh, Parvez Abdul Ajij

    2016-08-16

    Schottky junctions formed between semiconductors and metal contacts are ubiquitous in modern electronic and optoelectronic devices. Here we report on the physical properties of Schottky-junctions formed on hybrid perovskite CH3NH3PbBr3 single crystals. It is found that light illumination can significantly increase the dielectric constant of perovskite junctions by 2300%. Furthermore, such Pt/perovskite junctions are used to fabricate self-biased photodetectors. A photodetectivity of 1.4 × 1010 Jones is obtained at zero bias, which increases to 7.1 × 1011 Jones at a bias of +3 V, and the photodetectivity remains almost constant in a wide range of light intensity. These devices also exhibit fast responses with a rising time of 70 μs and a falling time of 150 μs. As a result of the high crystal quality and low defect density, such single-crystal photodetectors show stable performance after storage in air for over 45 days. Our results suggest that hybrid perovskite single crystals provide a new platform to develop promising optoelectronic applications. © 2016 The Royal Society of Chemistry.

  18. Zinc Selenide-Based Schottky Barrier Detectors for Ultraviolet-A and Ultraviolet-B Detection

    Directory of Open Access Journals (Sweden)

    V. Naval

    2010-01-01

    Full Text Available Wide-bandgap semiconductors such as zinc selenide (ZnSe have become popular for ultraviolet (UV photodetectors due to their broad UV spectral response. Schottky barrier detectors made of ZnSe in particular have been shown to have both low dark current and high responsivity. This paper presents the results of electrical and optical characterization of UV sensors based on ZnSe/Ni Schottky diodes fabricated using single-crystal ZnSe substrate with integrated UV-A (320–400 nm and UV-B (280–320 nm filters. For comparison, characteristics characterization of an unfiltered detector is also included. The measured photoresponse showed good discrimination between the two spectral bands. The measured responsivities of the UV-A and UV-B detectors were 50 mA/W and 10 mA/W, respectively. A detector without a UV filter showed a maximum responsivity of about 110 mA/W at 375 nm wavelength. The speed of the unfiltered detector was found to be about 300 kHz primarily limited by the RC time constant determined largely by the detector area.

  19. Defect analyses of selective epitaxial grown GaAs on STI patterned (0 0 1) Si substrates

    Science.gov (United States)

    Kim, S. W.; Cho, Y. D.; Shin, C. S.; Park, W. K.; Kim, D. H.; Ko, D. H.

    2014-09-01

    The defects of GaAs layers grown on Si (001) substrate with patterned SiO2 structures were investigated using transmission electron microscopy. The compressive strain along the direction was induced in selectively grown GaAs epilayers.The defects such as stacking faults or microtwins were trapped near the GaAs/Si interface, over which defect free GaAs regions were formed from the middle of trench walls. It is suggested that the residual compressive strain in defect free GaAs layers is due to the patterned SiO2 structures.

  20. Defect studies in low-temperature-grown GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Bliss, David Emory [Univ. of California, Berkeley, CA (United States)

    1992-11-01

    High content of excess As is incorporated in GaAs grown by low-temperature molecular-beam-epitaxy (LTMBE). The excess As exists primarily as As antisite defects AsGa and a lesser extent of gallium vacancies VGa. The neutral AsGa-related defects were measured by infrared absorption at 1μm. Gallium vacancies, VGa, was investigated by slow positron annihilation. Dependence of defect contents on doping was studied by Si and Be dopants. No free carriers are generated by n-type or p-type doping up to 1019 cm-3 Si or Be. Raman data indicate Be occupies Ga substitutional sites but Si atom is not substitutional. Si induces more AsGa in the layer. As AsGa increases, photoquenchable AsGa decreases. Fraction of photoquenchable defects correlates to defects within 3 nearest neighbor separations disrupting the metastability. Annealing reduces neutral AsGa content around 500C, similar to irradiation damaged and plastically deformed GaAs, as opposed to bulk grown GaAs in which AsGa-related defects are stable up to 1100C. The lower temperature defect removal is due to VGa enhanced diffusion of AsGa to As precipitates. The supersaturated VGa and also decreases during annealing. Annealing kinetics for AsGa-related defects gives 2.0 ± 0.3 eV and 1.5 ± 0.3 eV migration enthalpies for the AsGa and VGa. This represents the difference between Ga and As atoms hopping into the vacancy. The non-photoquenchable AsGa-related defects anneal with an activation energy of 1.1 ± 0.3eV. Be acceptors can be activated by 800C annealing. Temperature difference between defect annealing and Be activation formation of AsGa-BeGa pairs. Si donors can only be partially activated.

  1. Defect studies in low-temperature-grown GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Bliss, D.E.

    1992-11-01

    High content of excess As is incorporated in GaAs grown by low-temperature molecular-beam-epitaxy (LTMBE). The excess As exists primarily as As antisite defects AsGa and a lesser extent of gallium vacancies V[sub Ga]. The neutral AsGa-related defects were measured by infrared absorption at 1[mu]m. Gallium vacancies, V[sub Ga], was investigated by slow positron annihilation. Dependence of defect contents on doping was studied by Si and Be dopants. No free carriers are generated by n-type or p-type doping up to 10[sup 19] cm[sup [minus]3] Si or Be. Raman data indicate Be occupies Ga substitutional sites but Si atom is not substitutional. Si induces more As[sub Ga] in the layer. As As[sub Ga] increases, photoquenchable As[sub Ga] decreases. Fraction of photoquenchable defects correlates to defects within 3 nearest neighbor separations disrupting the metastability. Annealing reduces neutral As[sub Ga] content around 500C, similar to irradiation damaged and plastically deformed Ga[sub As], as opposed to bulk grown GaAs in which As[sub Ga]-related defects are stable up to 1100C. The lower temperature defect removal is due to V[sub Ga] enhanced diffusion of As[sub Ga] to As precipitates. The supersaturated V[sub GA] and also decreases during annealing. Annealing kinetics for As[sub Ga]-related defects gives 2.0 [plus minus] 0.3 eV and 1.5 [plus minus] 0.3 eV migration enthalpies for the As[sub Ga] and V[sub Ga]. This represents the difference between Ga and As atoms hopping into the vacancy. The non-photoquenchable As[sub Ga]-related defects anneal with an activation energy of 1.1 [plus minus] 0.3eV. Be acceptors can be activated by 800C annealing. Temperature difference between defect annealing and Be activation formation of As[sub Ga]-Be[sub Ga] pairs. Si donors can only be partially activated.

  2. Tuning the electronic properties and Schottky barrier height of the vertical graphene/MoS2 heterostructure by an electric gating

    Science.gov (United States)

    Nguyen, Chuong V.

    2018-04-01

    In this paper, the electronic properties and Schottky contact in graphene/MoS2 (G/MoS2) heterostructure under an applied electric field are investigated by means of the density functional theory. It can be seen that the electronic properties of the G/MoS2 heterostructure are preserved upon contacting owing to the weak van der Waals interaction. We found that the n-type Schottky contact is formed in the G/MoS2 heterostructure with the Schottky barrier height of 0.49 eV. Furthermore, both Schottky contact and Schottky barrier height in the G/MoS2 heterostructure could be controlled by the applied electric field. If a positive electric field of 4 V/nm is applied to the system, a transformation from the n-type Schottky contact to the p-type one was observed, whereas the system keeps an n-type Schottky contact when a negative electric field is applied. Our results may provide helpful information to design, fabricate, and understand the physics mechanism in the graphene-based two-dimensional van der Waals heterostructures like as G/MoS2 heterostructure.

  3. Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

    International Nuclear Information System (INIS)

    Chen Liang; Qian Yun-Sheng; Zhang Yi-Jun; Chang Ben-Kang

    2012-01-01

    Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures. On the basis of our early research on the surface photovoltage of GaAs photocathodes, and comparative research before and after activation of reflection-mode GaAs photocathodes, we further the comparative research on transmission-mode GaAs photocathodes. An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer. By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure, we can obtain the equations for the surface photovoltage (SPV) curve before activation and the spectral response curve (SRC) after activation. Through experiments and fitting calculations for the designed material, the body-material parameters can be well fitted by the SPV before activation, and proven by the fitting calculation for SRC after activation. Through the comparative research before and after activation, the average surface escape probability (SEP) can also be well fitted. This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method, which only measures the body parameters by SRC after activation. It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes, and optimize the Cs-O activation technique in the future. (electromagnetism, optics, acoustics, heat transfer, classical mechanics, and fluid dynamics)

  4. Pulsed Capacitance Measurement of Silicon Carbide (SiC) Schottky Diode and SiC Metal Oxide Semiconductor

    National Research Council Canada - National Science Library

    Griffin, Timothy E

    2006-01-01

    The incremental capacitance C was measured for a silicon carbide (SiC) Schottky diode during a reverse-biasing pulse and for two SiC n-MOS transistors during a negative pulse to their source with the drain grounded...

  5. Ultra-wideband balanced schottky envelope detector for data communication with high bitrate to carrier frequency ratio

    DEFF Research Database (Denmark)

    Granja, Angel Blanco; Cimoli, Bruno; Rodriguez, Sebastian

    2017-01-01

    This paper reports on an ultra-wideband (UWB) Schottky diode based balanced envelope detector for the L-, S-, C- and X- bands. The proposed circuit consists of a balun that splits the input signal into two 180° out of phase signals, a balanced detector, that demodulates the two signals, a low pass...

  6. Evaluation of Schottky and MgO-based tunnelling diodes with different ferromagnets for spin injection in n-Si

    International Nuclear Information System (INIS)

    Uhrmann, T; Dimopoulos, T; Brueckl, H; Kovacs, A; Kohn, A; Weyers, S; Paschen, U; Smoliner, J

    2009-01-01

    In this work we present the electrical properties of sputter-deposited ferromagnetic (FM) Schottky diodes and MgO-based tunnelling diodes to n-doped (0 0 1) silicon. The effective Schottky barrier height (SBH) has been evaluated as a function of the FM electrode (Co 70 Fe 30 , Co 40 Fe 40 B 20 and Ni 80 Fe 20 ), the silicon doping density (10 15 to 10 18 cm -3 ), the MgO tunnelling barrier thickness (0, 1.5 and 2.5 nm) and post-deposition annealing up to 400 0 C. The ideality factors of the Schottky diodes are close to unity, indicating transport by thermionic emission and the absence of an interfacial oxide layer, which is confirmed by transmission electron microscopy. The effective SBH is found to be approximately 0.65 eV, independent of the FM material and decreasing with increasing doping density. The changes induced by high temperature annealing at the current-voltage characteristic of the Schottky diodes depend strongly on the FM electrode. The effective SBH for the tunnelling diodes is as low as 0.3 eV, which suggests a high density of oxide and interface traps. It is again independent of the FM electrode, decreasing with increasing doping density and annealing temperature. The inclusion of MgO leads to higher thermal stability of the tunnelling diodes. The measured contact resistance values are discussed with respect to the conductivity mismatch for spin injection and detection.

  7. Thermal stability study of semimetal graphite n-InP and n-GaN Schottky diodes

    Czech Academy of Sciences Publication Activity Database

    Yatskiv, Roman; Grym, Jan

    2013-01-01

    Roč. 28, č. 5 (2013) ISSN 0268-1242 R&D Projects: GA MŠk LD12014 Institutional support: RVO:67985882 Keywords : Gallium nitride * Schottky barrier diodes * Graphite Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 2.206, year: 2013

  8. Wavelength-dependent visible light response in vertically aligned nanohelical TiO2-based Schottky diodes

    Science.gov (United States)

    Kwon, Hyunah; Sung, Ji Ho; Lee, Yuna; Jo, Moon-Ho; Kim, Jong Kyu

    2018-01-01

    Enhancements in photocatalytic performance under visible light have been reported by noble metal functionalization on nanostructured TiO2; however, the non-uniform and discrete distribution of metal nanoparticles on the TiO2 surface makes it difficult to directly clarify the optical and electrical mechanisms. Here, we investigate the light absorption and the charge separation at the metal/TiO2 Schottky junctions by using a unique device architecture with an array of TiO2 nanohelixes (NHs) forming Schottky junctions both with Au-top and Pt-bottom electrodes. Wavelength-dependent photocurrent measurements through the Pt/TiO2 NHs/Au structures revealed that the origin of the visible light absorption and the separation of photogenerated carriers is the internal photoemission at the metal/nanostructured TiO2 Schottky junctions. In addition, a huge persistent photoconductivity was observed by the time-dependent photocurrent measurement, implying a long lifetime of the photogenerated carriers before recombination. We believe that the results help one to understand the role of metal functionalization on TiO2 and hence to enhance the photocatalytic efficiency by utilizing appropriately designed Schottky junctions.

  9. Modulation of electrical properties in Cu/n-type InP Schottky junctions using oxygen plasma treatment

    International Nuclear Information System (INIS)

    Kim, Hogyoung; Jung, Chan Yeong; Hyun Kim, Se; Cho, Yunae; Kim, Dong-Wook

    2015-01-01

    Using current–voltage (I–V) measurements, we investigated the effect of oxygen plasma treatment on the temperature-dependent electrical properties of Cu/n-type indium phosphide (InP) Schottky contacts at temperatures in the range 100–300 K. Changes in the electrical parameters were evident below 180 K for the low-plasma-power sample (100 W), which is indicative of the presence of a wider distribution of regions of low barrier height. Modified Richardson plots were used to obtain Richardson constants, which were similar to the theoretical value of 9.4 A cm −2 K −2 for n-type InP. This suggests that, for all the samples, a thermionic emission model including a spatially inhomogeneous Schottky barrier can be used to describe the charge transport phenomena at the metal/semiconductor interface. The voltage dependence of the reverse-bias current revealed that Schottky emission was dominant for the untreated and high-plasma-power (250 W) samples. For the low-plasma-power sample, Poole–Frenkel emission was dominant at low voltages, whereas Schottky emission dominated at higher voltages. Defect states and nonuniformity of the interfacial layer appear to be significant in the reverse-bias charge transport properties of the low-plasma-power sample. (paper)

  10. A High Frequency (HF) Inductive Power Transfer Circuit for High Temperature Applications Using SiC Schottky Diodes

    Science.gov (United States)

    Jordan, Jennifer L.; Ponchak, George E.; Spry, David J.; Neudeck, Philip G.

    2018-01-01

    Wireless sensors placed in high temperature environments, such as aircraft engines, are desirable to reduce the mass and complexity of routing wires. While communication with the sensors is straight forward, providing power wirelessly is still a challenge. This paper introduces an inductive wireless power transfer circuit incorporating SiC Schottky diodes and its operation from room temperature (25 C) to 500 C.

  11. Schottky barrier tuning of the graphene/SnS2 van der Waals heterostructures through electric field

    Science.gov (United States)

    Zhang, Fang; Li, Wei; Ma, Yaqiang; Dai, Xianqi

    2018-03-01

    Combining the electronic structures of two-dimensional monolayers in ultrathin hybrid nanocomposites is expected to display new properties beyond their single components. The effects of external electric field (Eext) on the electronic structures of monolayer SnS2 with graphene hybrid heterobilayers are studied by using the first-principle calculations. It is demonstrated that the intrinsic electronic properties of SnS2 and graphene are quite well preserved due to the weak van der Waals (vdW) interactions. We find that the n-type Schottky contacts with the significantly small Schottky barrier are formed at the graphene/SnS2 interface. In the graphene/SnS2 heterostructure, the vertical Eext can control not only the Schottky barriers (n-type and p-type) but also contact types (Schottky contact or Ohmic contact) at the interface. The present study would open a new avenue for application of ultrathin graphene/SnS2 heterostructures in future nano- and optoelectronics.

  12. Local irradiation effects of one-dimensional ZnO based self-powered asymmetric Schottky barrier UV photodetector

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Yaxue [School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 (China); Qi, Junjie, E-mail: junjieqi@ustb.edu.cn [School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 (China); Biswas, Chandan [Department of Electrical Engineering, University of California Los Angeles, California 90095 (United States); Li, Feng; Zhang, Kui; Li, Xin [School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 (China); Zhang, Yue, E-mail: yuezhang@ustb.edu.cn [School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 (China); Key Laboratory of New Energy Materials and Technologies, University of Science and Technology Beijing, Beijing 100083 (China)

    2015-09-15

    A self-powered metal-semiconductor-metal (MSM) UV photodetector was successfully fabricated based on Ag/ZnO/Au structure with asymmetric Schottky barriers. This exhibits excellent performance compared to many previous studies. Very high photo-to-dark current ratio (approximately 10{sup 5}–10{sup 6}) was demonstrated without applying any external bias, and very fast switching time of less than 30 ms was observed during the investigation. Opposite photocurrent direction was generated by irradiating different Schottky diodes in the fabricated photodetector. Furthermore, the device performance was optimized by largely irradiating both the ZnO microwire (MW) junctions. Schottky barrier effect theory and O{sub 2} adsorption–desorption theories were used to investigate the phenomenon. The device has potential applications in self-powered UV detection field and can be used as electrical power source for electronic, optoelectronic and mechanical devices. - Highlights: • A self-powered Schottky barrier UV photodetector based on 1-D ZnO is fabricated. • For the first time we investigate the local irradiation effects of UV detector. • Irradiating both the junctions and ZnO can optimize the performance of the device.

  13. A photoemission study of Mn grown on GaAs(100)

    International Nuclear Information System (INIS)

    James, D.; Riley, J.; Leckey, R.; Usher, B.; Sieber, N.; Seyller, Th.; Ley, L.

    2002-01-01

    Full text: Metal contacts on semiconductors have been an important area for device manufacture. The possibility of lattice matched growth of magnetic metals on semiconductors was once thought to be a unobtainable goal. More recently it has been found that transition metals can react with the semiconductor substrates, forming another lattice with a more comparable lattice constant, from which epitaxial growth can then proceed. Al grows epitaxially on GaN even with a lattice mismatch greater than 10%. In this instance, Al displaces Ga being driven by a larger heat of formation to produce an AlN buffer layer, on which Al can then grow. This paper investigates the room temperature deposition of Mn onto GaAs(100) at room temperature. The Photoemission study was carried out at the UEL56/2 PGM2 beam line at BESSY II in Berlin, Germany. Synchrotron radiation was used to observe the surface as thin layers of Mn were deposited. The interaction of manganese with the substrate tends to donate electron density to neighbouring atoms, decreasing binding energy. No further segregation of substitutional or interstitial Mn and Ga can be seen from angle dependence data at this temperature, with metallic manganese eventually attenuating the bulk Ga signal to the point where it is indistinguishable from the background. It is concluded that there the metal reacts with the semiconductor surface with some indiffusion as confirmed using SIMS. Previously, the reaction was only thought to have taken place above room temperature. The resulting structure consists of a Ga-As-Mn buffer layer as with the higher temperature depositions

  14. Structural, magnetic, and lattice-dynamical interface properties of epitactical iron films on InAs(001) and GaAs(001) substrates; Strukturelle, magnetische und gitterdynamische Grenzflaecheneigenschaften von epitaktischen Eisenfilmen auf InAs(001)- und GaAs(001)-Substraten

    Energy Technology Data Exchange (ETDEWEB)

    Peters, Robert

    2009-07-14

    In this thesis the structure, magnetism and interface properties of ferromagnet-semiconductor hybrid structures were investigated. The main goal of this thesis was to obtain information on physical properties at the interface between a ferromagnetic metal and a III-V semiconductor (SC). For this purpose Fe films that serve as ferromagnetic contacts were deposited in ultrahigh vacuum (UHV) on InAs(001) and GaAs(001) substrates, respectively, and investigated. Both systems are interesting model systems with respect to electrical spin injection from a ferromagnetic metal into a semiconductor. In order for spin injection to occur, it is known that a Schottky barrier must form at the Fe/SC interface. Film growth and film structure were investigated in-situ in UHV by electron diffraction (RHEED) and ex-situ by X-ray diffraction. For determining the magnetic properties {sup 57}Fe conversion electron Moessbauer spectroscopy (CEMS) combines with {sup 57}Fe probe-layer technique was employed at different temperatures. Further, the partial Fe phonon density of states (PDOS) at the Fe/InAs (001) interface was determined by nuclear resonant inelastic X-ray scattering (NRIXS) from a {sup 57}Fe probe-layer. The CEM spectra (at room temperature) provided relatively high values of the average hyperfine magnetic field of left angle B{sub hf} right angle {proportional_to} 27 T and of the most-probable hyperfine magnetic field of B{sub hf,} {sub peak} {proportional_to} 30 T. This provides evidence for relativ high average Fe magnetic moments of {proportional_to} 1.8 {mu}{sub B}. The partial Fe phonon density of states (PDOS) at the Fe/InAs(001) interface is remarkably modified as compared to that of bulk bcc Fe. Using magnetometry and {sup 57}Fe CEMS, a strong temperature dependent magnetization directions was observed for Fe/Tb multilayers on InAs(001). Furthermore it is shown that such Fe/Tb multilayers on p-InAs(001) with perpendicular spin texture are useful as potential

  15. Contact degradation of GaAs transferred electron devices

    International Nuclear Information System (INIS)

    Palmstroem, C.J.; Morgan, D.V.; Howes, M.J.

    1978-01-01

    The migration of contact material into the GaAs devices may degrade the device performance (noise, power output) and can shorten the mean time to failure of operational devices. In order to understand contact degradation the interdiffusion of gold/germanium contacts on gallium arsenide has been studied using Rutherford backscattering, ion microprobe (SIMS) and microbeam techniques. Both the depth profiling and imaging properties of the ion microprobe have been used. The microbeam was used for focused Rutherford backscattering giving a lateral resolution approximately 10 μm. When used in conjunction with angle lapped samples it allows analysis to be conducted to greater depths and hence one may use thicker contact films. The use of these techniques has enabled both the lateral and depth distributions of gold, germanium, gallium and arsenic to be obtained. These distributions have revealed gold and germanium spike formation beneath the contact. The information obtained provides insight into the mechanisms involved in the formation of ohmic contacts to gallium arsenide. The degradation of such contacts as a result of thermal and electrical effects is discussed. (Auth.)

  16. Semiconductor GaAs: electronic paramagnetic resonance new data

    International Nuclear Information System (INIS)

    Benchiguer, T.

    1994-04-01

    The topic of this study was to put to the fore, thanks to our electron spin resonance experiments, one charge transfer process, which was optically induced between the deep donor As + G a and the different acceptors, which were present in the material. We described these processes through a theoretical model, which we named charge transfer model. With this latter, we were able to trace a graph network, representing the As + G a concentration kinetics. Then we verified the compatibility of our model with one transport experiment. One experimental verification of our model were delivered, thanks to neutronic transmutation doping. The following stage was the study of defects, induced by thermal strains, to which the crystal was submitted during the cooling phase. At last we wanted to get round the non solved super hyperfine structure problem for GaAs by studying another III-V material for which she was resolved, namely gallium phosphide. (MML). 150 refs., 72 figs., 16 tabs., 3 annexes

  17. Point defects in GaAs and other semiconductors

    International Nuclear Information System (INIS)

    Ehrhart, P.; Karsten, K.; Pillukat, A.

    1993-01-01

    In order to understand the properties of intrinsic point defects and their interactions at high defect concentrations GaAs wafers were irradiated at 4.5 K with 3 MeV electrons up to a dose of 4 · 10 19 e - /cm 2 . The irradiated samples were investigated by X-ray Diffraction and optical absorption spectroscopy. The defect production increases linearly with irradiation dose and characteristic differences are observed for the two sublattices. The Ga-Frenkel pairs are strongly correlated and are characterized by much larger lattice relaxations (V rel = 2--3 atomic volumes) as compared to the As-Frenkel pairs (V rel ∼1 at. vol.). The dominating annealing stage around 300 K is attributed to the mobility of the Ga interstitial atoms whereas the As-interstitial atoms can recombine with their vacancies only around 500 K. These results are compared to those for InP, ZnSe and Ge. Implications for the understanding of the damage after ion irradiation and implantation are discussed

  18. Mediating broadband light into graphene–silicon Schottky photodiodes by asymmetric silver nanospheroids: effect of shape anisotropy

    Science.gov (United States)

    Bhardwaj, Shivani; Parashar, Piyush K.; Roopak, Sangita; Ji, Alok; Uma, R.; Sharma, R. P.

    2018-05-01

    Designing thinner, more efficient and cost-effective 2D materials/silicon Schottky photodiodes using the plasmonic concept is one of the most recent quests for the photovoltaic research community. This work demonstrates the enhanced performance of graphene–Si Schottky junction solar cells by introducing asymmetric spheroidal shaped Ag nanoparticles (NPs) embedded in a graphene monolayer (GML). The optical signatures of these Ag NPs (oblate, ortho-oblate, prolate and ortho-prolate) have been analyzed by discrete dipole approximation in terms of extinction efficiency and surface plasmon resonance tunability, against the quasi-static approximation. The spatial field distribution is enhanced by optimizing the size (a eff  =  100 nm) and aspect ratio (0.4) for all of the utilized Ag NPs with an optimized graphene environment (t  =  0.1 nm). An improvement of photon absorption in the thin Si wafer for the polychromatic spectral region (λ ~ 300–1100 nm) under an AM 1.5 G solar spectrum has been observed. This resulted in a photocurrent enhancement from 7.98 mA cm‑2 to 10.0 mA cm‑2 for oblate-shaped NPs integrated into GML/Si Schottky junction solar cells as compared to the bare cell. The structure used in this study to improve the graphene–Si Schottky junction’s performance is also advantageous for other graphene-like 2D material-based Schottky devices.

  19. Inhomogeneous barrier height effect on the current–voltage characteristics of an Au/n-InP Schottky diode

    International Nuclear Information System (INIS)

    Zeghdar, Kamal; Dehimi, Lakhdar; Saadoune, Achour; Sengouga, Nouredine

    2015-01-01

    We report the current–voltage (I–V) characteristics of the Schottky diode (Au/n-InP) as a function of temperature. The SILVACO-TCAD numerical simulator is used to calculate the I–V characteristic in the temperature range of 280–400 K. This is to study the effect of temperature on the I–V curves and assess the main parameters that characterize the Schottky diode such as the ideality factor, the height of the barrier and the series resistance. The I–V characteristics are analyzed on the basis of standard thermionic emission (TE) theory and the inhomogeneous barrier heights (BHs) assuming a Gaussian distribution. It is shown that the ideality factor decreases while the barrier height increases with increasing temperature, on the basis of TE theory. Furthermore, the homogeneous BH value of approximately 0.524 eV for the device has been obtained from the linear relationship between the temperature-dependent experimentally effective BHs and ideality factors. The modified Richardson plot, according to the inhomogeneity of the BHs, has a good linearity over the temperature range. The evaluated Richardson constant A * was 10.32 A·cm −2 ·K −2 , which is close to the theoretical value of 9.4 A·cm −2 ·K −2 for n-InP. The temperature dependence of the I–V characteristics of the Au/n-InP Schottky diode have been successfully explained on the basis of the thermionic emission (TE) mechanism with a Gaussian distribution of the Schottky barrier heights (SBHs). Simulated I–V characteristics are in good agreement with the measurements [Korucu D, Mammadov T S. J Optoelectronics Advanced Materials, 2012, 14: 41]. The barrier height obtained using Gaussian Schottky barrier distribution is 0.52 eV, which is about half the band gap of InP. (paper)

  20. Inhomogeneous barrier height effect on the current-voltage characteristics of an Au/n-InP Schottky diode

    Science.gov (United States)

    Zeghdar, Kamal; Dehimi, Lakhdar; Saadoune, Achour; Sengouga, Nouredine

    2015-12-01

    We report the current-voltage (I-V) characteristics of the Schottky diode (Au/n-InP) as a function of temperature. The SILVACO-TCAD numerical simulator is used to calculate the I-V characteristic in the temperature range of 280-400 K. This is to study the effect of temperature on the I-V curves and assess the main parameters that characterize the Schottky diode such as the ideality factor, the height of the barrier and the series resistance. The I-V characteristics are analyzed on the basis of standard thermionic emission (TE) theory and the inhomogeneous barrier heights (BHs) assuming a Gaussian distribution. It is shown that the ideality factor decreases while the barrier height increases with increasing temperature, on the basis of TE theory. Furthermore, the homogeneous BH value of approximately 0.524 eV for the device has been obtained from the linear relationship between the temperature-dependent experimentally effective BHs and ideality factors. The modified Richardson plot, according to the inhomogeneity of the BHs, has a good linearity over the temperature range. The evaluated Richardson constant A* was 10.32 A·cm-2·K-2, which is close to the theoretical value of 9.4 A·cm-2·K-2 for n-InP. The temperature dependence of the I-V characteristics of the Au/n-InP Schottky diode have been successfully explained on the basis of the thermionic emission (TE) mechanism with a Gaussian distribution of the Schottky barrier heights (SBHs). Simulated I-V characteristics are in good agreement with the measurements [Korucu D, Mammadov T S. J Optoelectronics Advanced Materials, 2012, 14: 41]. The barrier height obtained using Gaussian Schottky barrier distribution is 0.52 eV, which is about half the band gap of InP.

  1. Characterization technique for inhomogeneous 4H-SiC Schottky contacts: A practical model for high temperature behavior

    Science.gov (United States)

    Brezeanu, G.; Pristavu, G.; Draghici, F.; Badila, M.; Pascu, R.

    2017-08-01

    In this paper, a characterization technique for 4H-SiC Schottky diodes with varying levels of metal-semiconductor contact inhomogeneity is proposed. A macro-model, suitable for high-temperature evaluation of SiC Schottky contacts, with discrete barrier height non-uniformity, is introduced in order to determine the temperature interval and bias domain where electrical behavior of the devices can be described by the thermionic emission theory (has a quasi-ideal performance). A minimal set of parameters, the effective barrier height and peff, the non-uniformity factor, is associated. Model-extracted parameters are discussed in comparison with literature-reported results based on existing inhomogeneity approaches, in terms of complexity and physical relevance. Special consideration was given to models based on a Gaussian distribution of barrier heights on the contact surface. The proposed methodology is validated by electrical characterization of nickel silicide Schottky contacts on silicon carbide (4H-SiC), where a discrete barrier distribution can be considered. The same method is applied to inhomogeneous Pt/4H-SiC contacts. The forward characteristics measured at different temperatures are accurately reproduced using this inhomogeneous barrier model. A quasi-ideal behavior is identified for intervals spanning 200 °C for all measured Schottky samples, with Ni and Pt contact metals. A predictable exponential current-voltage variation over at least 2 orders of magnitude is also proven, with a stable barrier height and effective area for temperatures up to 400 °C. This application-oriented characterization technique is confirmed by using model parameters to fit a SiC-Schottky high temperature sensor's response.

  2. Temperature conditions for GaAs nanowire formation by Au-assisted molecular beam epitaxy

    International Nuclear Information System (INIS)

    Tchernycheva, M; Harmand, J C; Patriarche, G; Travers, L; Cirlin, G E

    2006-01-01

    Molecular beam epitaxial growth of GaAs nanowires using Au particles as a catalyst was investigated. Prior to the growth during annealing, Au alloyed with Ga coming from the GaAs substrate, and melted. Phase transitions of the resulting particles were observed in situ by reflection high-energy electron diffraction (RHEED). The temperature domain in which GaAs nanowire growth is possible was determined. The lower limit of this domain (320 deg. C) is close to the observed catalyst solidification temperature. Below this temperature, the catalyst is buried by GaAs growth. Above the higher limit (620 deg. C), the catalyst segregates on the surface with no significant nanowire formation. Inside this domain, the influence of growth temperature on the nanowire morphology and crystalline structure was investigated in detail by scanning electron microscopy and transmission electron microscopy. The correlation of the nanowire morphology with the RHEED patterns observed during the growth was established. Wurtzite GaAs was found to be the dominant crystal structure of the wires

  3. Multilayer self-organization of InGaAs quantum wires on GaAs surfaces

    International Nuclear Information System (INIS)

    Wang, Zhiming M.; Kunets, Vasyl P.; Xie, Yanze Z.; Schmidbauer, Martin; Dorogan, Vitaliy G.; Mazur, Yuriy I.; Salamo, Gregory J.

    2010-01-01

    Molecular-Beam Epitaxy growth of multiple In 0.4 Ga 0.6 As layers on GaAs (311)A and GaAs (331)A has been investigated by Atomic Force Microscopy and Photoluminescence. On GaAs (311)A, uniformly distributed In 0.4 Ga 0.6 As quantum wires (QWRs) with wider lateral separation were achieved, presenting a significant improvement in comparison with the result on single layer [H. Wen, Z.M. Wang, G.J. Salamo, Appl. Phys. Lett. 84 (2004) 1756]. On GaAs (331)A, In 0.4 Ga 0.6 As QWRs were revealed to be much straighter than in the previous report on multilayer growth [Z. Gong, Z. Niu, Z. Fang, Nanotechnology 17 (2006) 1140]. These observations are discussed in terms of the strain-field interaction among multilayers, enhancement of surface mobility at high temperature, and surface stability of GaAs (311)A and (331)A surfaces.

  4. Highly efficient single-junction GaAs thin-film solar cell on flexible substrate

    Science.gov (United States)

    Moon, Sunghyun; Kim, Kangho; Kim, Youngjo; Heo, Junseok; Lee, Jaejin

    2016-07-01

    There has been much interest in developing a thin-film solar cell because it is lightweight and flexible. The GaAs thin-film solar cell is a top contender in the thin-film solar cell market in that it has a high power conversion efficiency (PCE) compared to that of other thin-film solar cells. There are two common structures for the GaAs solar cell: n (emitter)-on-p (base) and p-on-n. The former performs better due to its high collection efficiency because the electron diffusion length of the p-type base region is much longer than the hole diffusion length of the n-type base region. However, it has been limited to fabricate highly efficient n-on-p single-junction GaAs thin film solar cell on a flexible substrate due to technical obstacles. We investigated a simple and fast epitaxial lift-off (ELO) method that uses a stress originating from a Cr/Au bilayer on a 125-μm-thick flexible substrate. A metal combination of AuBe/Pt/Au is employed as a new p-type ohmic contact with which an n-on-p single-junction GaAs thin-film solar cell on flexible substrate was successfully fabricated. The PCE of the fabricated single-junction GaAs thin-film solar cells reached 22.08% under air mass 1.5 global illumination.

  5. n-Type Doping of Vapor–Liquid–Solid Grown GaAs Nanowires

    Directory of Open Access Journals (Sweden)

    Gutsche Christoph

    2011-01-01

    Full Text Available Abstract In this letter, n-type doping of GaAs nanowires grown by metal–organic vapor phase epitaxy in the vapor–liquid–solid growth mode on (111B GaAs substrates is reported. A low growth temperature of 400°C is adjusted in order to exclude shell growth. The impact of doping precursors on the morphology of GaAs nanowires was investigated. Tetraethyl tin as doping precursor enables heavily n-type doped GaAs nanowires in a relatively small process window while no doping effect could be found for ditertiarybutylsilane. Electrical measurements carried out on single nanowires reveal an axially non-uniform doping profile. Within a number of wires from the same run, the donor concentrations ND of GaAs nanowires are found to vary from 7 × 1017 cm-3 to 2 × 1018 cm-3. The n-type conductivity is proven by the transfer characteristics of fabricated nanowire metal–insulator-semiconductor field-effect transistor devices.

  6. Ab initio structural and vibrational properties of GaAs diamondoids and nanocrystals

    Directory of Open Access Journals (Sweden)

    Mudar Ahmed Abdulsattar

    2014-12-01

    Full Text Available Gallium arsenide diamondoids structural and vibrational properties are investigated using density functional theory at the PBE/6-31(d level and basis including polarization functions. Variation of energy gap as these diamondoids increase in size is seen to follow confinement theory for diamondoids having nearly equiaxed dimensions. Density of energy states transforms from nearly single levels to band structure as we reach larger diamondoids. Bonds of surface hydrogen with As atoms are relatively localized and shorter than that bonded to Ga atoms. Ga-As bonds have a distribution range of values due to surface reconstruction and effect of bonding to hydrogen atoms. Experimental bulk Ga-As bond length (2.45 Å is within this distribution range. Tetrahedral and dihedral angles approach values of bulk as we go to higher diamondoids. Optical-phonon energy of larger diamondoids stabilizes at 0.037 eV (297 cm-1 compared to experimental 0.035 eV (285.2 cm-1. Ga-As force constant reaches 1.7 mDyne/Å which is comparable to Ga-Ge force constant (1.74 mDyne/Å. Hydrogen related vibrations are nearly constant and serve as a fingerprint of GaAs diamondoids while Ga-As vibrations vary with size of diamondoids.

  7. GaAs Refractive Index Dependence On Carrier Density and Optimizing Terahertz Devices

    Science.gov (United States)

    Kim, Christopher; Wu, Dong Ho; Graber, Benjamin

    GaAs is used for various applications, including high speed transistors, high-efficiency photovoltaic cells, electro-optics and terahertz (THz) emitters and detectors. To date, information on the refractive index of GaAs is available only over a limited wave spectrum of 0.2-17um, where the refractive index varies from 1.3 to 5.0. As detailed information on the refractive index of GaAs at THz frequencies is not available or inadequate for our effort to develop an improved GaAs-based THz emitter, we experimentally investigated the behavior of the refractive index of GaAs for different charge carrier densities, especially with or without the presence of surface plasma. Using a Time Domain THz Spectrometer, which is capable of measuring THz pulses containing a wave spectrum over 100-3000um with a time accuracy better than 6 femtoseconds, we measured the delay of THz pulses traversing through a GaAs substrate of known thickness while modulating the charge carrier concentration. From the experimental data we estimated the refractive index for THz frequencies to vary from 3.5 to 3.8 for different charge carrier concentrations. We will discuss details of our experiments and implications of our experimental results, especially for our GaAs-based THz devices.

  8. Lateral terahertz hot-electron bolometer based on an array of Sn nanothreads in GaAs

    Science.gov (United States)

    Ponomarev, D. S.; Lavrukhin, D. V.; Yachmenev, A. E.; Khabibullin, R. A.; Semenikhin, I. E.; Vyurkov, V. V.; Ryzhii, M.; Otsuji, T.; Ryzhii, V.

    2018-04-01

    We report on the proposal and the theoretical and experimental studies of the terahertz hot-electron bolometer (THz HEB) based on a gated GaAs structure like the field-effect transistor with the array of parallel Sn nanothreads (Sn-NTs). The operation of the HEB is associated with an increase in the density of the delocalized electrons due to their heating by the incoming THz radiation. The quantum and the classical device models were developed, the quantum one was based on the self-consistent solution of the Poisson and Schrödinger equations, the classical model involved the Poisson equation and density of states omitting quantization. We calculated the electron energy distributions in the channels formed around the Sn-NTs for different gate voltages and found the fraction of the delocalized electrons propagating across the energy barriers between the NTs. Since the fraction of the delocalized electrons strongly depends on the average electron energy (effective temperature), the proposed THz HEB can exhibit an elevated responsivity compared with the HEBs based on more standard heterostructures. Due to a substantial anisotropy of the device structure, the THz HEB may demonstrate a noticeable polarization selectivity of the response to the in-plane polarized THz radiation. The features of the THz HEB might be useful in their practical applications in biology, medicine and material science.

  9. Current oscillations in Schottky-barrier CNTFET: towards resonant tunneling device operation

    Science.gov (United States)

    Shaker, Ahmed; Ossaimee, Mahmoud

    2018-03-01

    In this work, it has been shown that current oscillations could be enhanced in Schottky-barrier carbon nanotube FET (SB-CNFET) particularly at the low drain voltage and small channel lengths. This oscillatory dependence on the gate voltage brings out negative differential transconductance regions. We have simulated the SB-CNTFET using a 2D quantum simulator by solving NEGF and Poisson’s equation self-consistently. A parabolic potential well profile between double barriers is formed along the transport direction of the channel which is responsible for these oscillations. Key factors that affect the current oscillations are thoroughly investigated such as drain voltage, channel length, CNT diameter, the dielectric constant of the gate oxide and temperature. The results of this work pave a way to shed light on the feasibility and enhancement of SB-CNTFET as a resonant tunneling device.

  10. Temperature dependence of barrier height in Ni/n-GaN Schottky barrier diode

    Science.gov (United States)

    Maeda, Takuya; Okada, Masaya; Ueno, Masaki; Yamamoto, Yoshiyuki; Kimoto, Tsunenobu; Horita, Masahiro; Suda, Jun

    2017-05-01

    The temperature dependence of barrier height in a Ni/n-GaN Schottky barrier diode fabricated on a GaN homoepitaxial layer was investigated by capacitance-voltage, current-voltage, and internal photoemission measurements in the range of 223-573 K. The barrier height obtained by these methods linearly decreased with increasing temperature. The temperature coefficient was -(1.7-2.3) × 10-4 eV/K, which is about half of the temperature coefficient of the band gap reported previously. This indicates that the decrease in the barrier height may mainly reflect the shrinkage of the band gap (lowering of the conduction band edge) in GaN with increasing temperature.

  11. Photovoltaic characterization of graphene/silicon Schottky junctions from local and macroscopic perspectives

    Science.gov (United States)

    Hájková, Zdeňka; Ledinský, Martin; Vetushka, Aliaksei; Stuchlík, Jiří; Müller, Martin; Fejfar, Antonín; Bouša, Milan; Kalbáč, Martin; Frank, Otakar

    2017-05-01

    We present Schottky junction solar cell composed of graphene transferred onto hydrogenated amorphous and microcrystalline silicon, a low-cost alternative to well-explored crystalline silicon. We demonstrated sample with open-circuit voltage of 445 mV, a remarkable value for undoped graphene-based solar cell. Photovoltaic characteristics of this sample remained stable over 11 months and could be further improved by doping. The graphene/silicon junctions were characterized by current-voltage curves obtained locally by conductive atomic force microscopy (C-AFM) and macroscopically by standard solar simulator. Very good correlation between both independent measurements proved C-AFM as highly useful tool for photovoltaic characterization on nano- and micrometer scale.

  12. A simple drain current model for Schottky-barrier carbon nanotube field effect transistors

    International Nuclear Information System (INIS)

    Jimenez, D; Cartoixa, X; Miranda, E; Sune, J; Chaves, F A; Roche, S

    2007-01-01

    We report on a new computational model to efficiently simulate carbon nanotube-based field effect transistors (CNT-FET). In the model, a central region is formed by a semiconducting nanotube that acts as the conducting channel, surrounded by a thin oxide layer and a metal gate electrode. At both ends of the semiconducting channel, two semi-infinite metallic reservoirs act as source and drain contacts. The current-voltage characteristics are computed using the Landauer formalism, including the effect of the Schottky barrier physics. The main operational regimes of the CNT-FET are described, including thermionic and tunnel current components, capturing ambipolar conduction, multichannel ballistic transport and electrostatics dominated by the nanotube capacitance. The calculations are successfully compared to results given by more sophisticated methods based on non-equilibrium Green's function formalism (NEGF)

  13. Plasmonic silicon Schottky photodetectors: The physics behind graphene enhanced internal photoemission

    Directory of Open Access Journals (Sweden)

    Uriel Levy

    2017-02-01

    Full Text Available Recent experiments have shown that the plasmonic assisted internal photoemission from a metal to silicon can be significantly enhanced by introducing a monolayer of graphene between the two media. This is despite the limited absorption in a monolayer of undoped graphene ( ∼ π α = 2.3 % . Here we propose a physical model where surface plasmon polaritons enhance the absorption in a single-layer graphene by enhancing the field along the interface. The relatively long relaxation time in graphene allows for multiple attempts for the carrier to overcome the Schottky barrier and penetrate into the semiconductor. Interface disorder is crucial to overcome the momentum mismatch in the internal photoemission process. Our results show that quantum efficiencies in the range of few tens of percent are obtainable under reasonable experimental assumptions. This insight may pave the way for the implementation of compact, high efficiency silicon based detectors for the telecom range and beyond.

  14. Modeling and Design of a New Flexible Graphene-on-Silicon Schottky Junction Solar Cell

    Directory of Open Access Journals (Sweden)

    Francesco Dell’Olio

    2016-10-01

    Full Text Available A new graphene-based flexible solar cell with a power conversion efficiency >10% has been designed. The environmental stability and the low complexity of the fabrication process are the two main advantages of the proposed device with respect to other flexible solar cells. The designed solar cell is a graphene/silicon Schottky junction whose performance has been enhanced by a graphene oxide layer deposited on the graphene sheet. The effect of the graphene oxide is to dope the graphene and to act as anti-reflection coating. A silicon dioxide ultrathin layer interposed between the n-Si and the graphene increases the open-circuit voltage of the cell. The solar cell optimization has been achieved through a mathematical model, which has been validated by using experimental data reported in literature. The new flexible photovoltaic device can be integrated in a wide range of microsystems powered by solar energy.

  15. Low Schottky barrier black phosphorus field-effect devices with ferromagnetic tunnel contacts.

    Science.gov (United States)

    Kamalakar, M Venkata; Madhushankar, B N; Dankert, André; Dash, Saroj P

    2015-05-13

    Black phosphorus (BP) has been recently unveiled as a promising 2D direct bandgap semiconducting material. Here, ambipolar field-effect transistor behavior of nanolayers of BP with ferromagnetic tunnel contacts is reported. Using TiO2/Co contacts, a reduced Schottky barrier transistor performance is achieved in the devices discussed here, with drain current modulation of four to six orders of magnitude and a mobility of μh ≈ 155 cm(2) V(-1) s(-1) for hole conduction at room temperature. Magnetoresistance calculations using a spin diffusion model reveal that the source-drain contact resistances in the BP device can be tuned by gate voltage to an optimal range for injection and detection of spin-polarized holes. The results of the study demonstrate the prospect of BP nanolayers for efficient nanoelectronic and spintronic devices. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  16. Effect of cooling on the efficiency of Schottky varactor frequency multipliers at millimeter waves

    Science.gov (United States)

    Louhi, Jyrki; Raiesanen, Antti; Erickson, Neal

    1992-01-01

    The efficiency of the Schottky diode multiplier can be increased by cooling the diode to 77 K. The main reason for better efficiency is the increased mobility of the free carriers. Because of that the series resistance decreases and a few dB higher efficiency can be expected at low input power levels. At high output frequencies and at high power levels, the current saturation decreases the efficiency of the multiplication. When the diode is cooled the maximum current of the diode increases and much more output power can be expected. There are also slight changes in the I-V characteristic and in the diode junction capacitance, but they have a negligible effect on the efficiency of the multiplier.

  17. Schottky MSM junctions for carrier depletion in silicon photonic crystal microcavities.

    Science.gov (United States)

    Haret, Laurent-Daniel; Checoury, Xavier; Bayle, Fabien; Cazier, Nicolas; Boucaud, Philippe; Combrié, Sylvain; de Rossi, Alfredo

    2013-04-22

    Collection of free carriers is a key issue in silicon photonics devices. We show that a lateral metal-semiconductor-metal Schottky junction is an efficient and simple way of dealing with that issue in a photonic crystal microcavity. Using a simple electrode design, and taking into account the optical mode profile, the resulting carrier distribution in the structure is calculated. We show that the corresponding effective free carrier lifetime can be reduced by 50 times when the bias is tuned. This allows one to maintain a high cavity quality factor under strong optical injection. In the fabricated structures, carrier depletion is correlated with transmission spectra and directly visualized by Electron Beam Induced Current pictures. These measurements demonstrate the validity of this carrier extraction principle. The design can still be optimized in order to obtain full carrier depletion at a smaller energy cost.

  18. Scanning ion deep level transient spectroscopy: II. Ion irradiated Au-Si Schottky junctions

    International Nuclear Information System (INIS)

    Laird, J S; Jagadish, C; Jamieson, D N; Legge, G J F

    2006-01-01

    Here we introduce a new technique called scanning ion deep level transient spectroscopy (SIDLTS) for the spatial analysis of electrically active defects in devices. In the first part of this paper, a simple theory behind SIDLTS was introduced and factors determining its sensitivity and resolution were discussed. In this paper, we demonstrate the technique on MeV boron implantation induced defects in an Au-Si Schottky junction. SIDLTS measurements are compared with capacitance DLTS measurements over the temperature range, 100-300 K. SIDLTS analyses indicate the presence of two levels, one of which was positively identified as the E c - 0.23 eV divacancy level. The high sensitivity of SIDLTS is verified and the advantages and limitations of the technique are discussed in light of non-exponential components in the charge transient response. Reasons for several undetected levels are also discussed

  19. High-Sensitivity and Low-Power Flexible Schottky Hydrogen Sensor Based on Silicon Nanomembrane.

    Science.gov (United States)

    Cho, Minkyu; Yun, Jeonghoon; Kwon, Donguk; Kim, Kyuyoung; Park, Inkyu

    2018-04-03

    High-performance and low-power flexible Schottky diode-based hydrogen sensor was developed. The sensor was fabricated by releasing Si nanomembrane (SiNM) and transferring onto a plastic substrate. After the transfer, palladium (Pd) and aluminum (Al) were selectively deposited as a sensing material and an electrode, respectively. The top-down fabrication process of flexible Pd/SiNM diode H 2 sensor is facile compared to other existing bottom-up fabricated flexible gas sensors while showing excellent H 2 sensitivity (Δ I/ I 0 > 700-0.5% H 2 concentrations) and fast response time (τ 10-90 = 22 s) at room temperature. In addition, selectivity, humidity, and mechanical tests verify that the sensor has excellent reliability and robustness under various environments. The operating power consumption of the sensor is only in the nanowatt range, which indicates its potential applications in low-power portable and wearable electronics.

  20. Study on the graphene/silicon Schottky diodes by transferring graphene transparent electrodes on silicon

    International Nuclear Information System (INIS)

    Wang, Xiaojuan; Li, Dong; Zhang, Qichong; Zou, Liping; Wang, Fengli; Zhou, Jun; Zhang, Zengxing

    2015-01-01

    Graphene/silicon heterostructures present a Schottky characteristic and have potential applications for solar cells and photodetectors. Here, we fabricated graphene/silicon heterostructures by using chemical vapor deposition derived graphene and n-type silicon, and studied the electronic and optoelectronic properties through varying their interface and silicon resistivity. The results exhibit that the properties of the fabricated configurations can be effectively modulated. The graphene/silicon heterostructures with a Si (111) interface and high resistivity show a better photovoltaic behavior and should be applied for high-performance photodetectors. With the combined atomic force microscopy and theoretical analysis, the possible origination is discussed. The work here should be helpful on exploring high-performance graphene/silicon photoelectronics. - Highlights: • Different graphene/silicon heterostructures were fabricated. • Electronic and optoelectronic properties of the heterostructures were studied. • Graphene/silicon heterostructures were further explored for photodetectors.

  1. Electrical properties of Sn/p-Si (MS) Schottky barrier diodes to be exposed to {sup 60}Co {gamma}-ray source

    Energy Technology Data Exchange (ETDEWEB)

    Karatas, S. [Department of Physics, Faculty of Sciences and Arts, University of Kahramanmaras, Suetcue Imam, 46100 Kahramanmaras (Turkey)]. E-mail: skaratas@ksu.edu.tr; Tueruet, A. [Department of Physics, Faculty of Sciences and Arts, Atatuerk University, 25240 Erzurum (Turkey)

    2006-10-15

    In this research, we have investigated the electrical properties of metal-semiconductor (Sn/p-Si) Schottky barrier diodes (SBDs) under {sup 60}Co gamma ({gamma})-rays. These devices is stressed with a zero-bias during {sup 60}Co {gamma} -ray source irradiation with the dose rate 2.12 kGy/h and total dose range was 0-500 kGy at room temperature. Electrical measurements of Sn/p-Si SBDs have been performed using current-voltage (I-V) and capacitance-voltage (C-V) techniques. Experimental results show that gamma-irradiation induces an increase in the barrier height {phi} {sub b}(C-V) obtained from reverse-bias C-V measurements with increasing dose rate. However, the barrier height {phi} {sub b}(I-V) obtained from forward-bias I-V measurements remained almost constant. This negligible change of {phi} {sub b}(I-V) is attributed to the low barrier height in regions associated with the surface termination of dislocations. On the other hand, the values of the ideality factor obtained from I-V measurements increased with increasing dose rate. The results show that the main effect of the radiation is the generation of laterally inhomogeneous defects near the semiconductor surface.

  2. Disruption of Higher Order DNA Structures in Friedreich's Ataxia (GAA)(n) Repeats by PNA or LNA Targeting

    DEFF Research Database (Denmark)

    Bergquist, Helen; Rocha, Cristina S. J.; Alvarez-Asencio, Ruben

    2016-01-01

    Expansion of (GAA)n repeats in the first intron of the Frataxin gene is associated with reduced mRNA and protein levels and the development of Friedreich’s ataxia. (GAA)n expansions form non-canonical structures, including intramolecular triplex (H-DNA), and R-loops and are associated with epigen...

  3. Graphene Schottky diodes: An experimental review of the rectifying graphene/semiconductor heterojunction

    International Nuclear Information System (INIS)

    Di Bartolomeo, Antonio

    2016-01-01

    In the past decade graphene has been one of the most studied materials for several unique and excellent properties. Due to its two dimensional nature, physical and chemical properties and ease of manipulation, graphene offers the possibility of integration with the existing semiconductor technology for next-generation electronic and sensing devices. In this context, the understanding of the graphene/semiconductor interface is of great importance since it can constitute a versatile standalone device as well as the building-block of more advanced electronic systems. Since graphene was brought to the attention of the scientific community in 2004, the device research has been focused on the more complex graphene transistors, while the graphene/semiconductor junction, despite its importance, has started to be the subject of systematic investigation only recently. As a result, a thorough understanding of the physics and the potentialities of this device is still missing. The studies of the past few years have demonstrated that graphene can form junctions with 3D or 2D semiconducting materials which have rectifying characteristics and behave as excellent Schottky diodes. The main novelty of these devices is the tunable Schottky barrier height, a feature which makes the graphene/semiconductor junction a great platform for the study of interface transport mechanisms as well as for applications in photo-detection, high-speed communications, solar cells, chemical and biological sensing, etc. In this paper, we review the state-of-the art of the research on graphene/semiconductor junctions, the attempts towards a modeling and the most promising applications.

  4. Current transport in Zn/p-Si(100) Schottky barrier diodes at high temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Karatas, S. [Department of Physics, Faculty of Sciences and Arts, Kahramanmaras Suetcue imam University, 46100 Kahramanmaras (Turkey)]. E-mail: skaratas@ksu.edu.tr; Altindal, S. [Department of Physics, Faculty of Arts and Sciences, Gazi University, 06500, Ankara (Turkey); Cakar, M. [Department of Chemistry, Faculty of Sciences and Arts, Kahramanmaras Suetcue imam University, 46100 Kahramanmaras (Turkey)

    2005-03-15

    In this study, we have performed behavior of the non-ideal forward bias current-voltage (I-V) and the reverse bias capacitance-voltage (C-V) characteristics of Zn/p-Si (metal-semiconductor) Schottky barrier diode (SBDs) with thin interfacial insulator layer. The forward bias I-V and reverse bias C-V characteristics of SBDs have been studied at the temperatures range of 300-400K. SBD parameters such as ideality factor n, the series resistance (R{sub S}) determined Cheung's functions and Schottky barrier height, {phi}{sub b}, are investigated as functions of temperature. The ideality factor n and R{sub S} were strongly temperature dependent and changed linearly with temperature and inverse temperature, respectively. The zero-bias barrier heights {phi}{sub b0}(I-V) calculated from I-V measurements show an unusual behavior that it was found to increase linearly with the increasing temperature. However, the barrier height {phi}{sub b}(C-V) calculated from C-V measurements at 500kHz frequency decreased linearly with the increasing temperature. The correlation between {phi}{sub b0}(I-V) and {phi}{sub b}(C-V) barrier heights have been explained by taking into account ideality factors n and the tunneling factor ({alpha}{chi}{sup 1/2}{delta}) in the current transport mechanism. Also, the temperature dependence of energy distribution of interface state density (N{sub SS}) was determined from the forward I-V measurements by taking into account the bias dependence of the effective barrier height. The higher values of n and R{sub S} were attributed to the presence of a native insulator on Si surface and to high density of interface states localized at semiconductor-native oxide layer (Si/SiO{sub 2}) interface.

  5. P3HT-graphene bilayer electrode for Schottky junction photodetectors

    Science.gov (United States)

    Aydın, H.; Kalkan, S. B.; Varlikli, C.; Çelebi, C.

    2018-04-01

    We have investigated the effect of a poly (3-hexylthiophene-2.5-diyl)(P3HT)-graphene bilayer electrode on the photoresponsivity characteristics of Si-based Schottky photodetectors. P3HT, which is known to be an electron donor and absorb light in the visible spectrum, was placed on CVD grown graphene by dip-coating method. The results of the UV-vis and Raman spectroscopy measurements have been evaluated to confirm the optical and electronic modification of graphene by the P3HT thin film. Current-voltage measurements of graphene/Si and P3HT-graphene/Si revealed rectification behavior confirming a Schottky junction formation at the graphene/Si interface. Time-resolved photocurrent spectroscopy measurements showed the devices had excellent durability and a fast response speed. We found that the maximum spectral photoresponsivity of the P3HT-graphene/Si photodetector increased more than three orders of magnitude compared to that of the bare graphene/Si photodetector. The observed increment in the photoresponsivity of the P3HT-graphene/Si samples was attributed to the charge transfer doping from P3HT to graphene within the spectral range between near-ultraviolet and near-infrared. Furthermore, the P3HT-graphene electrode was found to improve the specific detectivity and noise equivalent power of graphene/Si photodetectors. The obtained results showed that the P3HT-graphene bilayer electrodes significantly improved the photoresponsivity characteristics of our samples and thus can be used as a functional component in Si-based optoelectronic device applications.

  6. Fabrication and characterization of TO/GaSe/(Ag, Au) Schottky diodes

    Science.gov (United States)

    Qasrawi, A. F.

    2006-06-01

    The optical properties of amorphous GaSe thin films deposited onto tin oxide (TO) coated glass substrates are presented for the purpose of using this material for the fabrication of metal-semiconductor devices. Specifically, the room temperature direct allowed and forbidden transition energy band gaps of glass/TO and glass/TO/GaSe films are estimated and found to exhibit values of 3.95 and 1.95 eV, respectively. The temperature dependence of the energy band gap of the glass/TO/GaSe is also studied in the temperature range of 295-450 K by means of optical transmittance and reflectance spectra. This study allowed the identification of the rate of change of the band gap with temperature as -5.0 × 10-4 eV K-1 and the 0 K energy band gap as 2.1 eV. The above reported optical parameters of the glass/TO/GaSe structure seem to be suitable for semiconductor device production such as solar cell converters, metal-insulator-semiconductor (MIS), metal-oxide-semiconductor (MOS), MOSFET, etc devices. As an application, we have used the glass/TO/GaSe substrate for fabricating Schottky diodes using Ag and Au point contacts. The diodes are characterized by measuring the current (I)-voltage (V) characteristics at room temperature. The I-V curves exhibit rectifying properties. The I-V data analysis in the Schottky region (below 1.0 V) revealed barrier heights of 0.60 and 0.73 eV for Ag and Au point contacts, respectively.

  7. Electrical and noise properties of proton irradiated 4H-SiC Schottky diodes

    Science.gov (United States)

    Kozlovski, V. V.; Lebedev, A. A.; Levinshtein, M. E.; Rumyantsev, S. L.; Palmour, J. W.

    2018-01-01

    The current voltage characteristics and the low-frequency noise in high voltage 4H-SiC junction barrier Schottky diodes irradiated with high energy (15 MeV) protons were studied at different temperatures and irradiation doses Φ from 3 × 1012 cm-2 to 1 × 1014 cm-2. Irradiation led to the increase of the base resistance and the appearance of slow relaxation processes at small, V ≤ 0.2 V, and at rather high, V ≥ 2 V, forward voltages. The characteristic times of these relaxation processes ranged from ˜1 μs to 103 s. The exponential part of the current-voltage characteristic was only weakly affected by irradiation. The temperature dependence of the base resistance changed exponentially with temperature with activation energy Ea ˜ 0.6 eV, indicating that the Z1/2 level plays a dominant role in this process. The temperature increase also led to the increase of the ideality factor from 1.05 at 25 °C to 1.1 at 172 °C. At elevated temperatures and high forward voltages V > 2-4 V, the current voltage characteristics tend to be super-linear. It is concluded that at high voltages, the space charge limited current of majority carriers (electrons) and hole injection from the p-n regions play an important role in the formation of the current voltage characteristic. The frequency dependences of noise spectral density S of proton irradiated Schottky diodes have the unusual form of S ˜ 1/f 0.5.

  8. Significant improvement in the electrical characteristics of Schottky barrier diodes on molecularly modified Gallium Nitride surfaces

    Science.gov (United States)

    Garg, Manjari; Naik, Tejas R.; Pathak, C. S.; Nagarajan, S.; Rao, V. Ramgopal; Singh, R.

    2018-04-01

    III-Nitride semiconductors face the issue of localized surface states, which causes fermi level pinning and large leakage current at the metal semiconductor interface, thereby degrading the device performance. In this work, we have demonstrated the use of a Self-Assembled Monolayer (SAM) of organic molecules to improve the electrical characteristics of Schottky barrier diodes (SBDs) on n-type Gallium Nitride (n-GaN) epitaxial films. The electrical characteristics of diodes were improved by adsorption of SAM of hydroxyl-phenyl metallated porphyrin organic molecules (Zn-TPPOH) onto the surface of n-GaN. SAM-semiconductor bonding via native oxide on the n-GaN surface was confirmed using X-ray photoelectron spectroscopy measurements. Surface morphology and surface electronic properties were characterized using atomic force microscopy and Kelvin probe force microscopy. Current-voltage characteristics of different metal (Cu, Ni) SBDs on bare n-GaN were compared with those of Cu/Zn-TPPOH/n-GaN and Ni/Zn-TPPOH/n-GaN SBDs. It was found that due to the molecular monolayer, the surface potential of n-GaN was decreased by ˜350 mV. This caused an increase in the Schottky barrier height of Cu and Ni SBDs from 1.13 eV to 1.38 eV and 1.07 eV to 1.22 eV, respectively. In addition to this, the reverse bias leakage current was reduced by 3-4 orders of magnitude for both Cu and Ni SBDs. Such a significant improvement in the electrical performance of the diodes can be very useful for better device functioning.

  9. Technology CAD of silicided Schottky barrier MOSFET for elevated source-drain engineering

    International Nuclear Information System (INIS)

    Saha, A.R.; Chattopadhyay, S.; Bose, C.; Maiti, C.K.

    2005-01-01

    Technology CAD has been used to study the performance of a silicided Schottky barrier (SB) MOSFET with gate, source and drain contacts realized with nickel-silicide. Elevated source-drain structures have been used towards the S/D engineering of CMOS devices. A full process-to-device simulation has been employed to predict the performance of sub-micron SB n-MOSFETs for the first time. A model for the diffusion and alloy growth kinetics has been incorporated in SILVACO-ATLAS and ATHENA to explore the processing and design parameter space for the Ni-silicided MOSFETs. The temperature and concentration dependent diffusion model for NiSi have been developed and necessary material parameters for nickel-silicide and epitaxial-Si have been incorporated through the C-interpreter function. Two-dimensional (2D) process-to-device simulations have also been used to study the dc and ac (RF) performance of silicided Schottky barrier (SB) n-MOSFETs. The extracted sheet resistivity, as a function of annealing temperature of the silicided S/D contacts, is found to be lower than the conventional contacts currently in use. It is also shown that the Technology CAD has the full capability to predict the possible dc and ac performance enhancement of a MOSFET with elevated S/D structures. While the simulated dc performance shows a clear enhancement, the RF analyses show no performance degradation in the cut-off frequency/propagation delay and also improve the ac performance due to the incorporation of silicide contacts in the S/D region

  10. Technology CAD of silicided Schottky barrier MOSFET for elevated source-drain engineering

    Energy Technology Data Exchange (ETDEWEB)

    Saha, A.R. [Department of Electronics and ECE, IIT, Kharagpur 721302 (India)]. E-mail: ars.iitkgp@gmail.com; Chattopadhyay, S. [Department of Electronics and ECE, IIT, Kharagpur 721302 (India); School of Electrical, Electronics and Computer Engineering, University of Newcastle, Newcastle upon Tyne (United Kingdom); Bose, C. [Department of Electronics and Telecommunication Engineering, Jadavpur University, Calcutta 700032 (India); Maiti, C.K. [Department of Electronics and ECE, IIT, Kharagpur 721302 (India)

    2005-12-05

    Technology CAD has been used to study the performance of a silicided Schottky barrier (SB) MOSFET with gate, source and drain contacts realized with nickel-silicide. Elevated source-drain structures have been used towards the S/D engineering of CMOS devices. A full process-to-device simulation has been employed to predict the performance of sub-micron SB n-MOSFETs for the first time. A model for the diffusion and alloy growth kinetics has been incorporated in SILVACO-ATLAS and ATHENA to explore the processing and design parameter space for the Ni-silicided MOSFETs. The temperature and concentration dependent diffusion model for NiSi have been developed and necessary material parameters for nickel-silicide and epitaxial-Si have been incorporated through the C-interpreter function. Two-dimensional (2D) process-to-device simulations have also been used to study the dc and ac (RF) performance of silicided Schottky barrier (SB) n-MOSFETs. The extracted sheet resistivity, as a function of annealing temperature of the silicided S/D contacts, is found to be lower than the conventional contacts currently in use. It is also shown that the Technology CAD has the full capability to predict the possible dc and ac performance enhancement of a MOSFET with elevated S/D structures. While the simulated dc performance shows a clear enhancement, the RF analyses show no performance degradation in the cut-off frequency/propagation delay and also improve the ac performance due to the incorporation of silicide contacts in the S/D region.

  11. A high performance charge plasma PN-Schottky collector transistor on silicon-on-insulator

    Science.gov (United States)

    Loan, Sajad A.; Bashir, Faisal; Rafat, M.; Alamoud, Abdul Rehman M.; Abbasi, Shuja A.

    2014-09-01

    In this paper, we propose a new high performance PN-Schottky collector (PN-SC) lateral bipolar junction transistor (BJT) on silicon-on-insulator (SOI). The proposed device addresses the problem of poor speed of conventional lateral PNP-BJT device by using a Schottky collector. Further, it does not use the conventional ways of ion implantation/diffusion to realize n and p type doped region. However, it uses metal electrodes of different work functions to create n and p type charge plasma in an undoped silicon film. The simulation study of the proposed lateral PN-SC bipolar charge plasma transistor on SOI (PN-SC-BCPT) device has shown a significant improvement in current gain (β), cutoff frequency (f T) and switching performance in comparison to conventional PNP-BJT and PNP-bipolar charge plasma transistor (PNP-BCPT) devices. A significantly high β is obtained in the proposed PN-SC-BCPT (˜2100) in comparison to PNP-BCPT (˜1450) and the conventional BJT (˜9) devices, respectively. It has been observed that there is 89.56% and 153.5% increase in f T for the proposed PN-SC-BCPT device (2.18 GHz) in comparison to conventional PNP-BJT (1.15 GHz) and PNP-BCPT (0.86 GHz) devices, respectively. Further, reductions of 24.6% and 15.4% in switching ON-delay and 66% and 30.76% in switching OFF-delay have been achieved in the proposed device based inverters in comparison to PNP-BCPT and the conventional BJT devices based inverters, respectively. Furthermore, the proposed device does not face doping related issues and the requirement of high temperature processing is absent.

  12. High-temperature Schottky diode characteristics of bulk ZnO

    Energy Technology Data Exchange (ETDEWEB)

    Guer, Emre; Tuezemen, S; Kilic, Bayram; Coskun, C [Department of Physics, Faculty of Arts and Sciences, Atatuerk University, 25240 Erzurum (Turkey)

    2007-05-16

    Current-voltage (I-V) measurements of Ag/n-ZnO have been carried out at temperatures of 200-500 K in order to understand the temperature dependence of the diode characteristics. Forward-bias I-V analysis results in a Schottky barrier height of 0.82 eV and an ideality factor of 1.55 at room temperature. The barrier height of 0.74 eV and Richardson constant of 0.248 A K{sup -2} cm{sup -2} were also calculated from the Richardson plot, which shows nearly linear characteristics in the temperature range 240-440 K. From the nk{sub b}T/q versus k{sub b}T/q graph, where n is ideality factor, k{sub b} the Boltzmann constant, T the temperature and q the electronic charge we deduce that thermionic field emission (TFE) is dominant in the charge transport mechanism. At higher sample temperatures (>440 K), a trap-assisted tunnelling mechanism is proposed due to the existence of a deep donor situated at E{sub c}-0.62 eV with 3.3 x 10{sup -15} cm{sup 2} capture cross section observed by both deep-level transient spectroscopy (DLTS) and lnI{sub 0} versus 1/k{sub b}T plots. The ideality factor almost remains constant in the temperature range 240-400 K, which shows the stability of the Schottky contact in this temperature range.

  13. Optimization of the GaAs et GaAs/Si annealing using halogen lamp flashes

    International Nuclear Information System (INIS)

    Blanck, H.

    1989-01-01

    The aim of the work is to check whether the flash annealing of GaAs and GaAs/Si, using halogen lamps, allows an improvement in the results obtained by usual methods. The electrical activation, defects behavior and results uniformity are studied. The results on the activation and diffusion of implanted impurities are shown to be equivalent to those obtained with classical annealing methods. However, residual impurities (or defects) diffusion phenomena are restrained by the flash annealing technique. The Hall effect cartographic measurements showed an improvement of the uniformity of the implanted coating surface resistance. Flash annealing is a suitable method for the Si activation in GaAs. It allows an improvement of the GaAs results obtained with standard techniques, as well as the formation, by means of ion implantation, of active zones in the GaAs/Si layers [fr

  14. GaAs Industry in Europe-Technologies, Trends and New Developments

    Science.gov (United States)

    Jung, Helmut; Blanck, Hervé; Bösch, Wolfgang; Mayock, Jim

    The GaAs industry has been growing immensely during recent years. This is mainly driven by the tremendous growth of the wireless communication market, which is still continuously growing. Additionally, an emerging mmW market with applications in automotive, defense and optoelectronics is further driving the demand for GaAs components. The two largest European GaAs fabrication companies, UMS and Filtronic are very well positioned to address the complete frequency range from 1GHz up to 100GHz for commercial, high volume low cost markets, as well as individual niche applications. An overview of the companies' structures, their processes and design capabilities and also their new product developments will be presented in this paper.

  15. Influence of substrate orientation on the structural properties of GaAs nanowires in MOCVD

    International Nuclear Information System (INIS)

    Muhammad, R.; Othaman, Z.; Ibrahim, Z.; Sakrani, S.; Wahab, Y.

    2016-01-01

    In this study, the effect of substrate orientation on the structural properties of GaAs nanowires grown by a metal organic chemical vapor deposition has been investigated. Gold colloids were used as catalyst to initiate the growth of nanowiresby the vapour-liquid-solid (VLS) mechanism. From the field-emission scanning electron microscopy (FE-SEM), the growth of the nanowires were at an elevation angle of 90°, 60°, 65° and 35° with respect to the GaAs substrate for (111)B, (311)B, (110) and (100) orientations respectively. The preferential NW growth direction is always <111>B. High-resolution transmission electron microscope (HRTEM) micrograph showed the NWs that grew on the GaAs(111)B has more structural defects when compared to others. Energy dispersive X-ray analysis (EDX) indicated the presence of Au, Ga and As. The bigger diameter NWs dominates the (111)B substrate surface.

  16. Electronic structure of GaAs with InAs (001) monolayer

    International Nuclear Information System (INIS)

    Tit, N.; Peressi, M.

    1995-04-01

    The effect on the electronic structure of an InAs monomolecular plane inserted in bulk GaAs is investigated theoretically. The (InAs) 1 (GaAs) n (001) strained superlattice is studied via ab-initio self-consistent pseudopotential calculations. Both electrons and holes are localized nearby the inserted InAs monolayer, which therefore acts as a quantum well for all the charge carriers. The small thickness of the inserted InAs slab is responsible of high confinement energies for the charge carriers, and therefore the interband electron-heavy-hole transition energy is close to the energy gap of the bulk GaAs, in agreement with recent experimental data. (author). 18 refs, 4 figs

  17. Neutron-damaged GaAs detectors for use in a Compton spectrometer

    International Nuclear Information System (INIS)

    Kammeraad, J.E.; Sale, K.E.; Wang, C.L.; Baltrusaitis, R.M.

    1992-01-01

    Detectors made of GaAs are being studies for use on the focal plane of a Compton spectrometer which measures 1-MeV to 25-MeV gamma rays with high energy resolution (1% or 100 keV, whichever is greater) and 200-ps time resolution. The detectors are GaAs chips that have been neutron-damaged to improve the time response. The detectors will be used to measure fast transient signals in the current mode. The properties of various GaAs detector configurations are being studied by bombarding sample detectors with short pulses of 4-MeV to 16-MeV electrons at the Linac Facility at EG ampersand G Energy Measurements, Inc., Santa Barbara Operations. Measurements of detector sensitivity and impulse response versus detector bias, thickness, and electron beam energy and intensity have been performed and are presented. 5 refs

  18. Origin of Fermi-level pinning at GaAs surfaces and interfaces

    Science.gov (United States)

    Colleoni, Davide; Miceli, Giacomo; Pasquarello, Alfredo

    2014-12-01

    Through first-principles simulation methods, we assign the origin of Fermi-level pinning at GaAs surfaces and interfaces to the bistability between the As-As dimer and two As dangling bonds, which transform into each other upon charge trapping. This defect is shown to be naturally formed both at GaAs surfaces upon oxygen deposition and in the near-interface substoichiometric oxide. Using electron-counting arguments, we infer that the identified defect occurs in opposite charge states. The Fermi-level pinning then results from the amphoteric nature of this defect which drives the Fermi level to its defect level. These results account for the experimental characterization at both GaAs surfaces and interfaces within a unified picture, wherein the role of As antisites is elucidated.

  19. Gallium loading of gold seed for high yield of patterned GaAs nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Boulanger, J. P.; Chia, A. C. E.; LaPierre, R. R., E-mail: lapierr@mcmaster.ca [Department of Engineering Physics, McMaster University, Hamilton, Ontario L8S 4L7 (Canada)

    2014-08-25

    A method is presented for maximizing the yield and crystal phase purity of vertically aligned Au-assisted GaAs nanowires grown with an SiO{sub x} selective area epitaxy mask on GaAs (111)B substrates. The nanowires were grown by the vapor-liquid-solid (VLS) method in a gas source molecular beam epitaxy system. During annealing, Au VLS seeds will alloy with the underlying GaAs substrate and collect beneath the SiO{sub x} mask layer. This behavior is detrimental to obtaining vertically aligned, epitaxial nanowire growth. To circumvent this issue, Au droplets were pre-filled with Ga assuring vertical yields in excess of 99%.

  20. Self-assembled colloidal PbS quantum dots on GaAs substrates

    International Nuclear Information System (INIS)

    Lue, Wei; Yamada, Fumihiko; Kamiya, Itaru

    2010-01-01

    We report the fabrication and analysis of self-assembled monolayer and bilayer films of colloidal PbS quantum dots (QDs) on GaAs (001) substrates. 1,6-hexanedithiol is used as link molecule between QDs and GaAs substrates. Atomic force microscopy (AFM) and photoluminescence (PL) measurements confirm the formation of PbS QD film on GaAs. For the monolayer PbS QD film, the temperature-dependent PL shows a feature typical of close-packed film. For the bilayer PbS QD film fabricated from two different mean-sized PbS QDs, we find that the stacking sequence of QDs with different size affects the quantum yield and emission wavelength of the film.

  1. Use of zinc diffusion into GaAs for determining properties of gallium interstitials

    Science.gov (United States)

    Bösker, G.; Stolwijk, N. A.; Hettwer, H.-G.; Rucki, A.; Jäger, W.; Södervall, U.

    1995-10-01

    The fast diffusion of Zn into GaAs has recently been attributed to a minor fraction of Zn interstitials changing over to Ga sites thereby producing interstitial Ga (IGa). This kick-out reaction provides the possibility to determine IGa transport properties from Zn diffusion experiments in virtually perfect GaAs but previous attempts were frustrated by diffusion-induced generation of microstructural defects acting as IGa sinks. The present study prevents such defect formation by utilizing Zn-doped GaAs powder as the diffusion source. Measured two-stage profiles show that under these conditions Zn diffusion at 906 °C is controlled by I3+Ga in addition to I2+Ga. Analysis of the profiles yield quantitative data on Ga- and Zn-related diffusivities, concentrations of IGa as well as the corresponding electronic transition energy.

  2. Influence of substrate orientation on the structural properties of GaAs nanowires in MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Muhammad, R., E-mail: rosnita@utm.my; Othaman, Z., E-mail: zulothaman@gmail.com; Ibrahim, Z., E-mail: zuhairi@utm.my; Sakrani, S., E-mail: samsudi3@yahoo.com [Faculty of Science, UniversitiTeknologi Malaysia, 81310 UTM, Johor (Malaysia); Wahab, Y., E-mail: wyussof@gmail.com [Razak School, UniversitiTeknologi Malaysia, 54100 Kuala Lumpur (Malaysia)

    2016-04-19

    In this study, the effect of substrate orientation on the structural properties of GaAs nanowires grown by a metal organic chemical vapor deposition has been investigated. Gold colloids were used as catalyst to initiate the growth of nanowiresby the vapour-liquid-solid (VLS) mechanism. From the field-emission scanning electron microscopy (FE-SEM), the growth of the nanowires were at an elevation angle of 90°, 60°, 65° and 35° with respect to the GaAs substrate for (111)B, (311)B, (110) and (100) orientations respectively. The preferential NW growth direction is always <111>B. High-resolution transmission electron microscope (HRTEM) micrograph showed the NWs that grew on the GaAs(111)B has more structural defects when compared to others. Energy dispersive X-ray analysis (EDX) indicated the presence of Au, Ga and As. The bigger diameter NWs dominates the (111)B substrate surface.

  3. A GaAs DETECTOR FOR DARK MATTER AND SOLAR NEUTRINO RESEARCH

    Energy Technology Data Exchange (ETDEWEB)

    T. BOWLES; ET AL

    2000-08-01

    The ability to produce large GaAs crystals with the requisite electronic properties to be fabricated into charged particle and photon detectors would provide a detector medium that would find numerous applications in both applied and fundamental research. Various applications would likely include x-ray detectors on satellites, environmental monitoring, medical imaging, bore hole mining spectroscopy, searches for dark matter, and solar neutrino research. We have carried out the development of GaAs detectors using two commercial crystal growing techniques. We have shown it should be able to grow detectors with 20 cm{sup 2} area and a depletion depth of 1 mm. Detectors of this size would find immediate applications in high-resolution, room temperature, low energy gamma ray measurements. We have also arrived at an understanding of the limitations of the common techniques used to grow GaAs and have determined that it should be possible to produce larger detectors using proprietary methods.

  4. GaAs quantum dots in a GaP nanowire photodetector

    Science.gov (United States)

    Kuyanov, P.; McNamee, S. A.; LaPierre, R. R.

    2018-03-01

    We report the structural, optical and electrical properties of GaAs quantum dots (QDs) embedded along GaP nanowires. The GaP nanowires contained p–i–n junctions with 15 consecutively grown GaAs QDs within the intrinsic region. The nanowires were grown by molecular beam epitaxy using the self-assisted vapor–liquid–solid process. The crystal structure of the NWs alternated between twinned ZB and WZ as the composition along the NW alternated between the GaP barriers and the GaAs QDs, respectively, leading to a polytypic structure with a periodic modulation of the NW sidewall facets. Photodetector devices containing QDs showed absorption beyond the bandgap of GaP in comparison to nanowires without QDs. Voltage-dependent measurements suggested a field emission process of carriers from the QDs.

  5. Si and gaas pixel detectors for medical imaging applications

    International Nuclear Information System (INIS)

    Bisogni, M. G.

    2001-01-01

    As the use of digital radiographic equipment in the morphological imaging field is becoming the more and more diffuse, the research of new and more performing devices from public institutions and industrial companies is in constant progress. Most of these devices are based on solid-state detectors as X-ray sensors. Semiconductor pixel detectors, originally developed in the high energy physics environment, have been then proposed as digital detector for medical imaging applications. In this paper a digital single photon counting device, based on silicon and GaAs pixel detector, is presented. The detector is a thin slab of semiconductor crystal where an array of 64 by 64 square pixels, 170- m side, has been built on one side. The data read-out is performed by a VLSI integrated circuit named Photon Counting Chip (PCC), developed within the MEDIPIX collaboration. Each chip cell geometrically matches the sensor pixel. It contains a charge preamplifier, a threshold comparator and a 15 bits pseudo-random counter and it is coupled to the detector by means of bump bonding. Most important advantages of such system, with respect to a traditional X-rays film/screen device, are the wider linear dynamic range (3x104) and the higher performance in terms of MTF and DQE. Besides the single photon counting architecture allows to detect image contrasts lower than 3%. Electronics read-out performance as well as imaging capabilities of the digital device will be presented. Images of mammographic phantoms acquired with a standard Mammographic tube will be compared with radiographs obtained with traditional film/screen systems

  6. Evidence of minority carrier injection efficiency >90% in an epitaxial graphene/SiC Schottky emitter bipolar junction phototransistor for ultraviolet detection

    Energy Technology Data Exchange (ETDEWEB)

    Chava, Venkata S. N., E-mail: vchava@email.sc.edu; Omar, Sabih U.; Brown, Gabriel; Shetu, Shamaita S.; Andrews, J.; Sudarshan, T. S.; Chandrashekhar, M. V. S. [Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208 (United States)

    2016-01-25

    In this letter, we report the UV detection characteristics of an epitaxial graphene (EG)/SiC based Schottky emitter bipolar phototransistor (SEPT) with EG on top as the transparent Schottky emitter layer. Under 0.43 μW UV illumination, the device showed a maximum common emitter current gain of 113, when operated in the Schottky emitter mode. We argue that avalanche gain and photoconductive gain can be excluded, indicating minority carrier injection efficiency, γ, as high as 99% at the EG/p-SiC Schottky junction. This high γ is attributed to the large, highly asymmetric barrier, which EG forms with the p-SiC. The maximum responsivity of the UV phototransistor is estimated to be 7.1 A/W. The observed decrease in gain with increase in UV power is attributed to recombination in the base region, which reduces the minority carrier lifetime.

  7. Involvement of Agrobacterium tumefaciens Galacturonate Tripartite ATP-Independent Periplasmic (TRAP) Transporter GaaPQM in Virulence Gene Expression.

    Science.gov (United States)

    Zhao, Jinlei; Binns, Andrew N

    2016-02-15

    Monosaccharides capable of serving as nutrients for the soil bacterium Agrobacterium tumefaciens are also inducers of the vir regulon present in the tumor-inducing (Ti) plasmid of this plant pathogen. One such monosaccharide is galacturonate, the predominant monomer of pectin found in plant cell walls. This ligand is recognized by the periplasmic sugar binding protein ChvE, which interacts with the VirA histidine kinase that controls vir gene expression. Although ChvE is also a member of the ChvE-MmsAB ABC transporter involved in the utilization of many neutral sugars, it is not involved in galacturonate utilization. In this study, a putative tripartite ATP-independent periplasmic (TRAP) transporter, GaaPQM, is shown to be essential for the utilization of galacturonic acid; we show that residue R169 in the predicted sugar binding site of the GaaP is required for activity. The gene upstream of gaaPQM (gaaR) encodes a member of the GntR family of regulators. GaaR is shown to repress the expression of gaaPQM, and the repression is relieved in the presence of the substrate for GaaPQM. Moreover, GaaR is shown to bind putative promoter regions in the sequences required for galacturonic acid utilization. Finally, A. tumefaciens strains carrying a deletion of gaaPQM are more sensitive to galacturonate as an inducer of vir gene expression, while the overexpression of gaaPQM results in strains being less sensitive to this vir inducer. This supports a model in which transporter activity is crucial in ensuring that vir gene expression occurs only at sites of high ligand concentration, such as those at a plant wound site. Copyright © 2016, American Society for Microbiology. All Rights Reserved.

  8. Some Aspects of the RHEED Behavior of Low-Temperature GaAs Growth

    International Nuclear Information System (INIS)

    Nemcsics, A.

    2005-01-01

    The reflection high-energy electron diffraction (RHEED) behavior manifested during MBE growth on a GaAs(001) surface under low-temperature (LT) growth conditions is examined in this study. RHEED and its intensity oscillations during LT GaAs growth exhibit some particular behavior. The intensity, phase, and decay of the oscillations depend on the beam equivalent pressure (BEP) ratio and substrate temperature, etc. Here, the intensity dependence of RHEED behavior on the BEP ratio, substrate temperature, and excess of As content in the layer are examined. The change in the decay constant of the RHEED oscillations is also discussed

  9. Electrical properties of Ga ion beam implanted GaAs epilayer

    International Nuclear Information System (INIS)

    Hirayama, Yoshiro; Okamoto, Hiroshi

    1985-01-01

    Resistivity enhancement by 5 orders or more was realized by Ga focused ion beam implantation into n + and p + GaAs epilayers. For originally n + epilayers, this resistivity enhancement is maintained after annealing as high as 800 deg C. However this enhancement disappears after annealing at above 650 deg C for p + epilayer. This property makes GaAs high resistive only in a limited area whose minimum dimension is 0.1 μm or less, and is attractive for a device fabrication process to electrically isolate integrated elements. (author)

  10. Dual-loss modulated Nd:GGG laser with Cr4+:YAG and GaAs

    Science.gov (United States)

    Qiao, Junpeng; Zhao, Jia; Li, Yufei; Zhao, Shengzhi; Yang, Kejian; Li, Guiqiu; Li, Dechun; Qiao, Wenchao; Li, Tao; Chu, Hongwei

    2014-12-01

    We demonstrate a diode-pumped dual-loss passively Q-switched and mode-locked (DP-QML) Nd:GGG laser by simultaneously employing Cr4+:YAG and GaAs as saturable absorbers. In comparison with single passively Q-switched and mode-locked (SP-QML) Nd:GGG laser with the Cr4+:YAG or GaAs, the maximum pulse width compression and the highest peak power improvement are 76.8% and 18.5 times in DP-QML laser, with the value of 67 ns and 2.9 kW, respectively.

  11. Polarity influence on the indentation punching of thin {111} GaAs foils at elevated temperatures

    International Nuclear Information System (INIS)

    Patriarche, G; Largeau, L; Riviere, J P; Bourhis, E Le

    2005-01-01

    Thin {111} GaAs substrates were deformed by a Vickers indenter at 350 deg. C-370 deg. C under loads ranging between 0.4 and 1.9 N. Optical microscopy and interferometry were used to observe the indented and opposite faces of the thin foils and hence to investigate the plastic flow through the samples. Attention was paid to the polarity (A or B) of the specimen surface, as GaAs is known to show a large difference between α and β dislocations mobilities. A model considering the influence of polarity is proposed to describe the material flow throughout thin samples

  12. Stable Amplification and High Current Drop Bistable Switching in Supercritical GaAs Tills

    DEFF Research Database (Denmark)

    Izadpanah, S.H; Jeppsson, B; Jeppesen, Palle

    1974-01-01

    Bistable switching with current drops of 40% and switching times of 100 ps are obtained in pulsed operation of 10¿m supercritically doped n+ nn+ GaAs Transferred Electron Devices (TEDs). When CW-operated the same devices exhibit a 5-17 GHz bandwidth for the stable negative resistance.......Bistable switching with current drops of 40% and switching times of 100 ps are obtained in pulsed operation of 10¿m supercritically doped n+ nn+ GaAs Transferred Electron Devices (TEDs). When CW-operated the same devices exhibit a 5-17 GHz bandwidth for the stable negative resistance....

  13. The spectral resolution of high temperature GaAs photon counting soft X-ray photodiodes

    Energy Technology Data Exchange (ETDEWEB)

    Barnett, A.M., E-mail: amb67@le.ac.uk [Space Research Centre, Department of Physics and Astronomy, Michael Atiyah Building, University of Leicester, Leicester LE1 7RH (United Kingdom); Lees, J.E.; Bassford, D.J. [Space Research Centre, Department of Physics and Astronomy, Michael Atiyah Building, University of Leicester, Leicester LE1 7RH (United Kingdom); Ng, J.S.; Tan, C.H.; Babazadeh, N.; Gomes, R.B. [Department of Electronic and Electrical Engineering, University of Sheffield, Mappin Street, Sheffield S1 3JD (United Kingdom)

    2011-10-21

    Circular mesa GaAs p{sup +}-i-n{sup +} diodes for photon counting soft X-ray spectroscopy have been fabricated and characterised over a temperature range of +80 to -30 {sup o}C. The spectroscopic performance of the diodes, as measured by the FWHM of the Mn K{sub {alpha}} X-ray line from an {sup 55}Fe radioisotope, is reported. In addition, we compare the GaAs diodes with previously fabricated and characterised Al{sub 0.8}Ga{sub 0.2}As p{sup +}-i-n{sup +} diodes of similar geometry.

  14. Molecular dynamics simulation of ion-beam-amorphization of Si, Ge and GaAs

    CERN Document Server

    Nord, J D; Keinonen, J

    2002-01-01

    We use molecular dynamics simulations to study ion-irradiation-induced amorphization in Si, Ge and GaAs using several different interatomic force models. We find that the coordination number is higher, and the average bond length longer, for the irradiated amorphous structures than for the molten ones in Si and Ge. For amorphous GaAs, we suggest that longer Ga-Ga bonds, also present in pure Ga, are produced during the irradiation. In Si the amorphization is found to proceed via growth of amorphous regions, and low energy recoils are found to induce athermal recrystallization during irradiation.

  15. The LDA+U calculation of electronic band structure of GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Bahuguna, B. P., E-mail: pk.svnit@gmail.com; Sharma, R. O.; Saini, L. K. [Applied Physics Department, Sardar Vallabhbhai National Institute of Technology, Surat-395007 (India)

    2016-05-06

    We present the electronic band structure of bulk gallium arsenide (GaAs) using first principle approach. A series of calculations has been performed by applying norm-conserving pseudopotentials and ultrasoft non-norm-conserving pseudopotentials within the density functional theory. These calculations yield too small band gap as compare to experiment. Thus, we use semiemperical approach called local density approximation plus the multi-orbital mean-field Hubbard model (LDA+U), which is quite effective in order to describe the band gap of GaAs.

  16. Modeling and Design of Graphene GaAs Junction Solar Cell

    Directory of Open Access Journals (Sweden)

    Yawei Kuang

    2015-01-01

    Full Text Available Graphene based GaAs junction solar cell is modeled and investigated by Silvaco TCAD tools. The photovoltaic behaviors have been investigated considering structure and process parameters such as substrate thickness, dependence between graphene work function and transmittance, and n-type doping concentration in GaAs. The results show that the most effective region for photo photogenerated carriers locates very close to the interface under light illumination. Comprehensive technological design for junction yields a significant improvement of power conversion efficiency from 0.772% to 2.218%. These results are in good agreement with the reported experimental work.

  17. Diode-pumped passively Q-switched Nd:GGG laser with a Bi-doped GaAs semiconductor saturable absorber

    Science.gov (United States)

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-12-01

    Passive Q-switching of a diode-pumped Nd:GGG laser is demonstrated using Bi-doped GaAs as saturable absorber. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. Compared with the Q-switched laser by undoped GaAs semiconductor saturable absorber, the laser with Bi-doped GaAs as saturable absorber can produce higher output power, shorter pulses, higher single pulse energies and higher peak powers. These results suggest that Bi-doped GaAs can be a promising new candidate of semiconductor saturable absorber in Q-switched laser.

  18. Passively Q-switched and mode-locked Nd:GGG laser with a Bi-doped GaAs saturable absorber.

    Science.gov (United States)

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-06-16

    A simultaneously passively Q-switched and mode-locked (QML) Nd:GGG laser using a Bi-doped GaAs wafer as saturable absorber is accomplished for the first time. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. In comparison to the passively QML laser with GaAs, the QML laser with Bi-doped GaAs can generate more stable pulses with 99% modulation depth. The experiment results indicate that the Bi-doped GaAs could be an excellent saturable absorber for diode-pumped QML lasers.

  19. Investigation of GaAs and InP surface passivation phenomena by sulfur; Badanie zjawiska pasywacji powierzchni GaAs i InP przy pomocy siarki

    Energy Technology Data Exchange (ETDEWEB)

    Przyborowska, K.; Surma, B. [Instytut Technologii Materialow Elektronicznych, Warsaw (Poland); Zakroczymski, T. [Polska Akademia Nauk, Warsaw (Poland). Inst. Chemii Fizycznej

    1997-12-01

    Some different chemical methods for sulfur passivation of GaAs and InP surface have been tried. The photoluminescence intensity has been compared for surfaces being sulfurized in different processes. Surface composition have been analysed by means of Auger electron spectroscopy. It has been found that passivation by sulfur of A{sup III}B{sup V} compounds diminishes the concentration of surface states and can be applied for preparing the epi-ready plates. 5 refs, 3 figs.

  20. Experimental analysis of the Schottky barrier height of metal contacts in black phosphorus field-effect transistors

    Science.gov (United States)

    Chang, Hsun-Ming; Fan, Kai-Lin; Charnas, Adam; Ye, Peide D.; Lin, Yu-Ming; Wu, Chih-I.; Wu, Chao-Hsin

    2018-04-01

    Compared to graphene and MoS2, studies on metal contacts to black phosphorus (BP) transistors are still immature. In this work, we present the experimental analysis of titanium contacts on BP based upon the theory of thermionic emssion. The Schottky barrier height (SBH) is extracted by thermionic emission methods to analyze the properties of Ti-BP contact. To examine the results, the band gap of BP is extracted followed by theoretical band alignment by Schottky-Mott rule. However, an underestimated SBH is found due to the hysteresis in electrical results. Hence, a modified SBH extraction for contact resistance that avoids the effects of hysteresis is proposed and demonstrated, showing a more accurate SBH that agrees well with theoretical value and results of transmission electron microscopy and energy-dispersive x-ray spectroscopy.