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Sample records for extreme ultraviolet xuv

  1. A Search for Extended Ultraviolet Disk (XUV-disk) Galaxies in the Local Universe

    CERN Document Server

    Thilker, David A; Meurer, Gerhardt; de Paz, Armando Gil; Boissier, Samuel; Madore, Barry F; Boselli, Alessandro; Ferguson, Annette M N; Muńoz-Mateos, Juan Carlos; Madsen, Greg J; Hameed, Salman; Overzier, Roderik A; Forster, Karl; Friedman, Peter G; Martin, D Christopher; Morrissey, Patrick; Neff, Susan G; Schiminovich, David; Seibert, Mark; Small, Todd; Wyder, Ted K; Donas, Jose; Heckman, Timothy M; Lee, Young-Wook; Milliard, Bruno; Rich, R Michael; Szalay, A S; Welsh, Barry Y; Yi, Sukyoung K

    2007-01-01

    We have initiated a search for extended ultraviolet disk (XUV-disk) galaxies in the local universe. Herein, we compare GALEX UV and visible--NIR images of 189 nearby (D$<$40 Mpc) S0--Sm galaxies included in the GALEX Atlas of Nearby Galaxies and present the first catalogue of XUV-disk galaxies. We find that XUV-disk galaxies are surprisingly common but have varied relative (UV/optical) extent and morphology. Type~1 objects ($\\ga$20% incidence) have structured, UV-bright/optically-faint emission features in the outer disk, beyond the traditional star formation threshold. Type~2 XUV-disk galaxies ($\\sim$10% incidence) exhibit an exceptionally large, UV-bright/optically-low-surface-brightness (LSB) zone having blue $UV-K_s$ outside the effective extent of the inner, older stellar population, but not reaching extreme galactocentric distance. If the activity occuring in XUV-disks is episodic, a higher fraction of present-day spirals could be influenced by such outer disk star formation. Type~1 disks are associa...

  2. Extreme Ultraviolet Radiation With Coherence Time Beyond 1 s

    CERN Document Server

    Benko, Craig; Cingöz, Arman; Hua, Linqiang; Labaye, François; Yost, Dylan C; Ye, Jun

    2014-01-01

    Many atomic and molecular systems of fundamental interest possess resonance frequencies in the extreme ultraviolet$^{1-3}$ (XUV), where laser technology is limited and radiation sources have traditionally lacked long-term phase coherence. Recent breakthroughs in XUV frequency comb technology have demonstrated spectroscopy with resolution at the MHz-level$^{4-6}$ but even higher resolutions are desired for future applications in precision measurement. By characterizing heterodyne beats between two XUV comb sources, we demonstrate the capability for sub-Hz spectral resolution. This corresponds to coherence times $> 1$ s, at photon energies up to 20 eV, more than 6 orders of magnitude longer than previously reported. We also identify various noise contributions to the obtainable comb linewidth in the XUV. This work establishes the ability of creating highly phase stable radiation in the XUV with performance rivaling that of visible light. Further, by direct sampling of the phase of the XUV light originating from...

  3. Controlled free-induction decay in the extreme ultraviolet

    CERN Document Server

    Bengtsson, Samuel; Kroon, David; Camp, Seth; Miranda, Miguel; Arnold, Cord L; L'Huillier, Anne; Schafer, Kenneth J; Gaarde, Mette B; Rippe, Lars; Mauritsson, Johan

    2016-01-01

    Coherent sources of attosecond extreme ultraviolet (XUV) radiation present many challenges if their full potential is to be realized. While many applications benefit from the broadband nature of these sources, it is also desirable to produce narrow band XUV pulses, or to study autoionizing resonances in a manner that is free of the broad ionization background that accompanies above-threshold XUV excitation. Here we demonstrate a method for controlling the coherent XUV free induction decay that results from using attosecond pulses to excite a gas, yielding a fully functional modulator for XUV wavelengths. We use an infrared (IR) control pulse to manipulate both the spatial and spectral phase of the XUV emission, sending the light in a direction of our choosing at a time of our choosing. This allows us to tailor the light using opto-optical modulation, similar to devices available in the IR and visible wavelength regions.

  4. Feasibility of Extreme Ultraviolet Active Optical Clock

    Institute of Scientific and Technical Information of China (English)

    ZHUANG Wei; CHEN Jing-Biao

    2011-01-01

    @@ We propose an experimental scheme of vacuum ultraviolet(VUV)and extreme ultraviolet(XUV)optical fre-quency standards with noble gas atoms.Considering metastable state 3P2 noble atoms pumped by a conventional discharging method,the atomic beam is collimated with transverse laser cooling at the metastable state and en-ters into the laser cavity in the proposed setup.Due to stimulated emission from the metasable state to the ground state inside the laser cavity consisting of VUV reflection coating mirrors,our calculations show that with enough population inversion to compensate for the cavity loss,an active optical frequency standard at VUV and XUV is feasible.

  5. Observation of molecular hyperfine structure in the extreme ultraviolet: The HF C-X spectrum

    NARCIS (Netherlands)

    Philippson, J.N.; Shiell, R.C.; Reinhold, E.M.; Ubachs, W.M.G.

    2008-01-01

    Clearly resolved hyperfine structure has been observed in the extreme ultraviolet (XUV) spectra of the C (1)Pi, v=0-X (1)Sigma(+), v=0 transition of (HF)-F-19 obtained through 1 XUV+1 UV resonance enhanced multiphoton ionization spectroscopy. The hyperfine splitting within the R-branch lines shows

  6. Spatially Resolved Fourier Transform Spectroscopy in the Extreme Ultraviolet

    CERN Document Server

    Jansen, G S M; Freisem, L; Eikema, K S E; Witte, S

    2016-01-01

    Coherent extreme ultraviolet (XUV) radiation produced by table-top high-harmonic generation (HHG) sources provides a wealth of possibilities in research areas ranging from attosecond physics to high resolution coherent imaging. However, it remains challenging to fully exploit the coherence of such sources for interferometry and Fourier transform spectroscopy (FTS). This is due to the need for a measurement system that is stable at the level of a wavelength fraction, yet allowing a controlled scanning of time delays. Here we demonstrate XUV interferometry and FTS in the 17-55 nm wavelength range using an ultrastable common-path interferometer suitable for high-intensity laser pulses that drive the HHG process. This approach enables the generation of fully coherent XUV pulse pairs with sub-attosecond timing variation, tunable time delay and a clean Gaussian spatial mode profile. We demonstrate the capabilities of our XUV interferometer by performing spatially resolved FTS on a thin film composed of titanium and...

  7. Frequency Comb Spectroscopy - From IR to XUV

    Science.gov (United States)

    2015-06-09

    sensitivity of highly charged ions. Unlike visible light, radiation in the extreme ultraviolet (XUV) has traditionally lacked long-term phase coherence...Direct frequency comb spectroscopy in the extreme ultraviolet ”, Nature, vol. 482, no. 7383, pp. 68 - 71, 2012. [2] C. Benko, Ruehl, A. , Martin, M...precision metrology and ultrafast science from the visible spectral region to the next exciting frontier of extreme ultraviolet (XUV) by developing

  8. Femtosecond transparency in the extreme ultraviolet

    CERN Document Server

    Tarana, Michal

    2011-01-01

    Electromagnetically induced transparency-like behavior in the extreme ultraviolet (XUV) is studied theoretically, including the effect of intense 800 nm laser dressing of He 2s2p (1Po) and 2p^2 (1Se) autoionizing states. We present an ab initio solution of the time-dependent Schrodinger equation (TDSE) in an LS-coupling configuration interaction basis set. The method enables a rigorous treatment of optical field ionization of these coupled autoionizing states into the N = 2 continuum in addition to N = 1. Our calculated transient absorption spectra show encouraging agreement with experiment.

  9. Development and Application of XUV Lasers

    Science.gov (United States)

    1993-01-01

    The focus of this program is the development of extreme ultraviolet (XUV) lasers and their application to scientific problems. Laser development concentrates...techniques. Such techniques should have a number of applications and be particularly useful in the life sciences. This report presents recent progress on XUV laser development

  10. Design of an extreme ultraviolet spectrometer suite to characterize rapidly heated solid matter

    Science.gov (United States)

    Ivancic, S. T.; Stillman, C. R.; Nelson, D.; Begishev, I. A.; Mileham, C.; Nilson, P. M.; Froula, D. H.

    2016-11-01

    An ultrafast streaked extreme-ultraviolet (XUV) spectrometer (5-20 nm) was developed to measure the temperature dynamics in rapidly heated samples. Rapid heating makes it possible to create exotic states of matter that can be probed during their inertial confinement time—tens of picoseconds in the case of micron-sized targets. In contrast to other forms of pyrometry, where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for a temperature measurement at the material-vacuum interface. The surface-temperature measurement constrains models for the release of high-energy-density material. Coupling the XUV spectrometer to an ultrafast (<2-ps) streak camera provided picosecond-time scale evolution of the surface-layer emission. Two high-throughput XUV spectrometers were designed to simultaneously measure the time-resolved and absolute XUV emission.

  11. Line image sensors for spectroscopic applications in the extreme ultraviolet

    Science.gov (United States)

    Banyay, Matus; Brose, Sascha; Juschkin, Larissa

    2009-10-01

    The spectral range of extreme ultraviolet radiation (XUV or EUV) is an active area of research incorporating many scientific fields such as microscopy, lithography or reflectometry. During the last decade, a lot of effort has been put into transferring many of the known techniques developed at linear accelerators into the laboratory using discharge-produced plasmas (DPPs) or laser-produced plasmas (LPPs) as an alternative light source. In particular, the semiconductor industry is in need of on-site tools in the shorter wavelength range for production and inspection of structured surfaces with nanometer resolution. Here traditional charge coupled device (CCD) image sensors are inapplicable as detectors because of the strong absorption of XUV by matter prohibiting any generation of electron-hole pairs inside a deep lying p-n junction. As a solution, two-dimensional backthinned CCDs are available in the market offering high sensitivity to XUV light. Although for many applications a one-dimensional line scanning image sensor would be sufficient, they are non-existent for XUV. It is only lately that manufacturers have started to adopt the principle of backthinning to CCD line sensors to enhance sensitivity in the long wavelength UV range (>200 nm). Here we show that generally these compact sensors offer good quantum efficiencies in the XUV which make them a candidate for many spectroscopic applications and future industrial inline inspection tools for which costly two-dimensional CCDs are oversized. We have successfully implemented a compact sensor device into a laboratory XUV spectrometer and reflectometer. Our measurements compare the quantum efficiency of a state-of-the-art XUV array CCD to a phosphor-coated line sensor and a new backthinned line sensor. Additionally, we show recorded spectra from a laboratory DPP source to demonstrate the potential of a wide range of applications.

  12. Manifestation of attosecond XUV fields temporal structures in attosecond streaking spectrogram

    Institute of Scientific and Technical Information of China (English)

    Guanglong Chen; Yunjiu Cao; Dong Eon Kim

    2011-01-01

    @@ The features of an attosecond extreme ultraviolet (XUV) field are encoded in the attosecond XUV spectrogram.We investigate the effect of the temporal structures of attosecond XUV fields on the attosecond streaking spectrogram.Factors such as the number of attosecond XUV pulses and the temporal chirp of attosecond XUV pulses are considered.Results indicate that unlike the attosecond streaking spectrogram for an attosecond XUV field with two pulses of a half-cycle separation of streaking field, the spectrogram for the attosecond XUV field with three pulses demonstrates fine spectral fringes in separated traces.%The features of an attosecond extreme ultraviolet (XUV) field are encoded in the attosecond XUV spectrogram. We investigate the effect of the temporal structures of attosecond XUV fields on the attosecond streaking spectrogram. Factors such as the number of attosecond XUV pulses and the temporal chirp of attosecond XUV pulses are considered. Results indicate that unlike the attosecond streaking spectrogram for an attosecond XUV field with two pulses of a half-cycle separation of streaking field, the spectrogram for the attosecond XUV field with three pulses demonstrates fine spectral fringes in separated traces.

  13. Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions

    NARCIS (Netherlands)

    Kuznetsov, A. S.; Stuik, R.; F. Bijkerk,; Shevelko, A. P.

    2012-01-01

    Intense extreme ultraviolet (XUV) radiation was observed during the interaction of low-temperature laser plasmas and wall materials. Laser plasmas with electron temperature T-e similar to 40 eV were created on massive solid targets (CF2 and Al) by an excimer KrF laser (248 nm/0.5 J/13 ns/1 Hz). The

  14. Ionization Chamber Measures Extreme Ultraviolet

    Science.gov (United States)

    Carlson, Robert W.

    1987-01-01

    Ionization chamber operates in nearly total photon absorption as stable, self-calibrating detector of ionizing extreme ultraviolet radiation. Working gas of instrument is neon; photoionization properties well known and readily applicable to absolute measurements. Designed for measurements of solar ultraviolet flux aboard sounding rocket, instrument used on Earth to measure ultraviolet radiation in vacuum systems. Ionization chamber collects positive neon ions and electrons produced by irradiation of neon gas by ultraviolet photons. Approximately one ion produced by each photon; consequently, photoionization current nearly proportional to photon flux.

  15. Frequency combs and precision spectroscopy in the extreme ultraviolet

    Science.gov (United States)

    Cingöz, Arman

    2012-06-01

    Development of the optical frequency comb has revolutionized optical metrology and precision spectroscopy due to its ability to provide a precise link between microwave and optical frequencies. A novel application that aims to extend the precision and accuracy obtained to the extreme ultraviolet (XUV) is the generation of XUV frequency combs via intracavity high harmonic generation (HHG). Recently, we have been able to generate > 200 μW average power per harmonic and demonstrate the comb structure of the high harmonics by resolving atomic argon and neon lines at 82 and 63 nm, respectively [1]. The argon transition linewidth of 10 MHz, limited by residual Doppler broadening, is unprecedented in this spectral region and places a stringent upper limit on the linewidth of individual comb teeth. To overcome this limitation, we have constructed two independent intracavity HHG sources to study the phase coherence directly via the heterodyne beats between them. With these developments, ultrahigh precision spectroscopy in the XUV is within grasp and has a wide range of applications that include tests of bound state quantum electrodynamics, development of nuclear clocks, and searches for variation of fundamental constants using the enhanced sensitivity of highly charged ions.[4pt] [1] Arman Cing"oz et al., Nature 482, 68 (2012).

  16. Interferometric time delay correction for Fourier transform spectroscopy in the extreme ultraviolet

    Science.gov (United States)

    Meng, Yijian; Zhang, Chunmei; Marceau, Claude; Naumov, A. Yu.; Corkum, P. B.; Villeneuve, D. M.

    2016-09-01

    We demonstrate a Fourier transform spectrometer in the extreme ultraviolet (XUV) spectrum using a high-harmonic source, with wavelengths as short as 32 nm. The femtosecond infrared laser source is divided into two separate foci in the same gas jet to create two synchronized XUV sources. An interferometric method to determine the relative delay between the two sources is shown to improve the accuracy of the delay time, with corrections of up to 200 asec required. By correcting the time base before the Fourier transform, the frequency resolution is improved by up to an order of magnitude.

  17. XUV ionization of aligned molecules

    Energy Technology Data Exchange (ETDEWEB)

    Kelkensberg, F.; Siu, W.; Gademann, G. [FOM Institute AMOLF, Science Park 104, NL-1098 XG Amsterdam (Netherlands); Rouzee, A.; Vrakking, M. J. J. [FOM Institute AMOLF, Science Park 104, NL-1098 XG Amsterdam (Netherlands); Max-Born-Institut, Max-Born Strasse 2A, D-12489 Berlin (Germany); Johnsson, P. [FOM Institute AMOLF, Science Park 104, NL-1098 XG Amsterdam (Netherlands); Department of Physics, Lund University, Post Office Box 118, SE-221 00 Lund (Sweden); Lucchini, M. [Department of Physics, Politecnico di Milano, Istituto di Fotonica e Nanotecnologie CNR-IFN, Piazza Leonardo da Vinci 32, 20133 Milano (Italy); Lucchese, R. R. [Department of Chemistry, Texas A and M University, College Station, Texas 77843-3255 (United States)

    2011-11-15

    New extreme-ultraviolet (XUV) light sources such as high-order-harmonic generation (HHG) and free-electron lasers (FELs), combined with laser-induced alignment techniques, enable novel methods for making molecular movies based on measuring molecular frame photoelectron angular distributions. Experiments are presented where CO{sub 2} molecules were impulsively aligned using a near-infrared laser and ionized using femtosecond XUV pulses obtained by HHG. Measured electron angular distributions reveal contributions from four orbitals and the onset of the influence of the molecular structure.

  18. Tracing molecular dynamics at the femto-/atto-second boundary through extreme-ultraviolet pump-probe spectroscopy

    CERN Document Server

    Carpeggiani, P A; Palacios, A; Gray, D; Martín, F; Charalambidis, D

    2013-01-01

    Coherent light pulses of few to hundreds of femtoseconds (fs) duration have prolifically served the field of ultrafast phenomena. While fs pulses address mainly dynamics of nuclear motion in molecules or lattices in the gas, liquid or condensed matter phase, the advent of attosecond pulses has in recent years provided direct experimental access to ultrafast electron dynamics. However, there are processes involving nuclear motion in molecules and in particular coupled electronic and nuclear motion that possess few fs or even sub-fs dynamics. In the present work we have succeeded in addressing simultaneously vibrational and electronic dynamics in molecular Hydrogen. Utilizing a broadband extreme-ultraviolet (XUV) continuum the entire, Frank-Condon allowed spectrum of H2 is coherently excited. Vibrational, electronic and ionization 1fs scale dynamics are subsequently tracked by means of XUV-pump-XUV-probe measurements. These reflect the intrinsic molecular behavior as the XUV probe pulse hardly distorts the mole...

  19. Spatio-temporal coherence of free-electron laser radiation in the extreme ultraviolet determined by a Michelson interferometer

    Science.gov (United States)

    Hilbert, V.; Rödel, C.; Brenner, G.; Döppner, T.; Düsterer, S.; Dziarzhytski, S.; Fletcher, L.; Förster, E.; Glenzer, S. H.; Harmand, M.; Hartley, N. J.; Kazak, L.; Komar, D.; Laarmann, T.; Lee, H. J.; Ma, T.; Nakatsutsumi, M.; Przystawik, A.; Redlin, H.; Skruszewicz, S.; Sperling, P.; Tiggesbäumker, J.; Toleikis, S.; Zastrau, U.

    2014-09-01

    A key feature of extreme ultraviolet (XUV) radiation from free-electron lasers (FELs) is its spatial and temporal coherence. We measured the spatio-temporal coherence properties of monochromatized FEL pulses at 13.5 nm using a Michelson interferometer. A temporal coherence time of (59±8) fs has been determined, which is in good agreement with the spectral bandwidth given by the monochromator. Moreover, the spatial coherence in vertical direction amounts to about 15% of the beam diameter and about 12% in horizontal direction. The feasibility of measuring spatio-temporal coherence properties of XUV FEL radiation using interferometric techniques advances machine operation and experimental studies significantly.

  20. Spatio-temporal coherence of free-electron laser radiation in the extreme ultraviolet determined by a Michelson interferometer

    Energy Technology Data Exchange (ETDEWEB)

    Hilbert, V.; Rödel, C.; Zastrau, U., E-mail: ulf.zastrau@uni-jena.de [Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität, Max-Wien-Platz 1, 07743 Jena (Germany); Brenner, G.; Düsterer, S.; Dziarzhytski, S.; Harmand, M.; Przystawik, A.; Redlin, H.; Toleikis, S. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); Döppner, T.; Ma, T. [Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550 (United States); Fletcher, L. [Department of Physics, University of California, Berkeley, California 94720 (United States); Förster, E. [Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität, Max-Wien-Platz 1, 07743 Jena (Germany); Helmholtz-Institut Jena, Fröbelstieg 3, 07743 Jena (Germany); Glenzer, S. H.; Lee, H. J. [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); Hartley, N. J. [Department of Physics, Clarendon Laboratory, University of Oxford, Parks Road, Oxford OX1 3PU (United Kingdom); Kazak, L.; Komar, D.; Skruszewicz, S. [Institut für Physik, Universität Rostock, 18051 Rostock (Germany); and others

    2014-09-08

    A key feature of extreme ultraviolet (XUV) radiation from free-electron lasers (FELs) is its spatial and temporal coherence. We measured the spatio-temporal coherence properties of monochromatized FEL pulses at 13.5 nm using a Michelson interferometer. A temporal coherence time of (59±8) fs has been determined, which is in good agreement with the spectral bandwidth given by the monochromator. Moreover, the spatial coherence in vertical direction amounts to about 15% of the beam diameter and about 12% in horizontal direction. The feasibility of measuring spatio-temporal coherence properties of XUV FEL radiation using interferometric techniques advances machine operation and experimental studies significantly.

  1. Extreme ultraviolet Talbot interference lithography.

    Science.gov (United States)

    Li, Wei; Marconi, Mario C

    2015-10-05

    Periodic nanopatterns can be generated using lithography based on the Talbot effect or optical interference. However, these techniques have restrictions that limit their performance. High resolution Talbot lithography is limited by the very small depth of focus and the demanding requirements in the fabrication of the master mask. Interference lithography, with large DOF and high resolution, is limited to simple periodic patterns. This paper describes a hybrid extreme ultraviolet lithography approach that combines Talbot lithography and interference lithography to render an interference pattern with a lattice determined by a Talbot image. As a result, the method enables filling the arbitrary shaped cells produced by the Talbot image with interference patterns. Detailed modeling, system design and experimental results using a tabletop EUV laser are presented.

  2. Control of coherent excitation of neon in the extreme ultraviolet regime.

    Science.gov (United States)

    Plenge, Jürgen; Wirsing, Andreas; Raschpichler, Christopher; Wassermann, Bernhard; Rühl, Eckart

    2011-01-01

    Coherent excitation of a superposition of Rydberg states in neon by the 13th harmonic of an intense 804 nm pulse and the formation of a wave packet is reported. Pump-probe experiments are performed, where the 3d-manifold of the 2p6-->2p5 (2P3/2) 3d [1/2]1- and 2p6-->2p5 (2P3/2) 3d [3/2]1-transitions are excited by an extreme ultraviolet (XUV) radiation pulse, which is centered at 20.05 eV photon energy. The temporal evolution of the excited state population is probed by ionization with a time-delayed 804 nm pulse. Control of coherent transient excitation and wave packet dynamics in the XUV-regime is demonstrated, where the spectral phase of the 13th harmonic is used as a control parameter. Modulation of the phase is achieved by propagation of the XUV-pulse through neon of variable gas density. The experimental results indicate that phase-shaped high-order harmonics can be used to control fundamental coherent excitation processes in the XUV-regime.

  3. Ionization avalanching in clusters ignited by extreme-ultraviolet driven seed electrons

    CERN Document Server

    Schütte, Bernd; Mermillod-Blondin, Alexandre; Vrakking, Marc J J; Rouzée, Arnaud; Fennel, Thomas

    2016-01-01

    We study the ionization dynamics of Ar clusters exposed to ultrashort near-infrared (NIR) laser pulses for intensities well below the threshold at which tunnel ionization could ignite the nanoplasma formation. We find that the emission of highly charged ions up to Ar$^{8+}$ can be switched on with unit contrast by generating only a few seed electrons with an ultrashort extreme ultraviolet (XUV) pulse prior to the NIR field. Molecular dynamics simulations can explain the experimental observations and predict a generic scenario where efficient heating via inverse bremsstrahlung and NIR avalanching are followed by resonant collective nanoplasma heating. The temporally and spatially well-controlled injection of the XUV seed electrons opens new routes for controlling avalanching and heating phenomena in nanostructures and solids, with implications for both fundamental and applied laser-matter science.

  4. Table-Top Milliwatt-Class Extreme Ultraviolet High Harmonic Light Source

    CERN Document Server

    Klas, Robert; Tschernajew, Maxim; Hädrich, Steffen; Shamir, Yariv; Tünnermann, Andreas; Rothhardt, Jan; Limpert, Jens

    2016-01-01

    Extreme ultraviolet (XUV) lasers are essential for the investigation of fundamental physics. Especially high repetition rate, high photon flux sources are of major interest for reducing acquisition times and improving signal to noise ratios in a plethora of applications. Here, an XUV source based on cascaded frequency conversion is presented, which delivers due to the drastic better single atom response for short wavelength drivers, an average output power of (832 +- 204) {\\mu}W at 21.7 eV. This is the highest average power produced by any HHG source in this spectral range surpassing precious demonstrations by more than a factor of four. Furthermore, a narrow-band harmonic at 26.6 eV with a relative energy bandwidth of only {\\Delta}E/E= 1.8 x 10E-3 has been generated, which is of high interest for high precision spectroscopy experiments.

  5. Generation of isolated attosecond extreme ultraviolet pulses employing nanoplasmonic field enhancement: optimization of coupled ellipsoids

    Energy Technology Data Exchange (ETDEWEB)

    Stebbings, S L; Suessmann, F; Yang, Y-Y; Kling, M F [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermann-Strass e 1, 85748 Garching (Germany); Scrinzi, A [Ludwig-Maximilians-Universitaet Muenchen, Theresienstrasse 37, 80333 Muenchen (Germany); Durach, M; Rusina, A; Stockman, M I, E-mail: sarah.stebbings@mpq.mpg.de, E-mail: mstockman@gsu.edu, E-mail: matthias.kling@mpq.mpg.de [Department of Physics and Astronomy, Georgia State University, 29 Peachtree Center Avenue, Atlanta, GA 30303 (United States)

    2011-07-15

    The production of extreme ultraviolet (XUV) radiation via nanoplasmonic field-enhanced high-harmonic generation (HHG) in gold nanostructures at MHz repetition rates is investigated theoretically in this paper. Analytical and numerical calculations are employed and compared in order to determine the plasmonic fields in gold ellipsoidal nanoparticles. The comparison indicates that numerical calculations can accurately predict the field enhancement and plasmonic decay, but may encounter difficulties when attempting to predict the oscillatory behavior of the plasmonic field. Numerical calculations for coupled symmetric and asymmetric ellipsoids for different carrier-envelope phases (CEPs) of the driving laser field are combined with time-dependent Schroedinger equation simulations to predict the resulting HHG spectra. The studies reveal that the plasmonic field oscillations, which are controlled by the CEP of the driving laser field, play a more important role than the nanostructure configuration in finding the optimal conditions for the generation of isolated attosecond XUV pulses via nanoplasmonic field enhancement.

  6. Generation of isolated attosecond extreme ultraviolet pulses employing nanoplasmonic field enhancement: optimization of coupled ellipsoids

    Science.gov (United States)

    Stebbings, S. L.; Süßmann, F.; Yang, Y.-Y.; Scrinzi, A.; Durach, M.; Rusina, A.; Stockman, M. I.; Kling, M. F.

    2011-07-01

    The production of extreme ultraviolet (XUV) radiation via nanoplasmonic field-enhanced high-harmonic generation (HHG) in gold nanostructures at MHz repetition rates is investigated theoretically in this paper. Analytical and numerical calculations are employed and compared in order to determine the plasmonic fields in gold ellipsoidal nanoparticles. The comparison indicates that numerical calculations can accurately predict the field enhancement and plasmonic decay, but may encounter difficulties when attempting to predict the oscillatory behavior of the plasmonic field. Numerical calculations for coupled symmetric and asymmetric ellipsoids for different carrier-envelope phases (CEPs) of the driving laser field are combined with time-dependent Schrödinger equation simulations to predict the resulting HHG spectra. The studies reveal that the plasmonic field oscillations, which are controlled by the CEP of the driving laser field, play a more important role than the nanostructure configuration in finding the optimal conditions for the generation of isolated attosecond XUV pulses via nanoplasmonic field enhancement.

  7. Extreme ultraviolet emission from dense plasmas generated with sub-10-fs laser pulses

    CERN Document Server

    Osterholz, J; Cerchez, M; Fischer, T; Hemmers, D; Hidding, B; Pipahl, A; Pretzler, G; Rose, S J; Willi, O

    2008-01-01

    The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3*10^16 W/cm^2 is investigated for different target materials. K shell spectra are obtained from low Z targets (carbon and boron nitride). In the spectra a series limit for the hydrogen and helium like resonance lines is observed indicating that the plasma is at high density and pressure ionization has removed the higher levels. In addition, L shell spectra from titanium targets were obtained. Basic features of the K and L shell spectra are reproduced with computer simulations. The calculations include hydrodynamic simulation of the plasma expansion and collisional radiative calculations of the XUV emission.

  8. Extreme Ultraviolet Explorer Bright Source List

    Science.gov (United States)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  9. XUV free-electron laser-based projection lithography systems

    Energy Technology Data Exchange (ETDEWEB)

    Newnam, B.E.

    1990-01-01

    Free-electron laser sources, driven by rf-linear accelerators, have the potential to operate in the extreme ultraviolet (XUV) spectral range with more than sufficient average power for high-volume projection lithography. For XUV wavelengths from 100 nm to 4 nm, such sources will enable the resolution limit of optical projection lithography to be extended from 0.25 {mu}m to 0.05{mu}m and with an adequate total depth of focus (1 to 2 {mu}m). Recent developments of a photoinjector of very bright electron beams, high-precision magnetic undulators, and ring-resonator cavities raise our confidence that FEL operation below 100 nm is ready for prototype demonstration. We address the motivation for an XUV FEL source for commercial microcircuit production and its integration into a lithographic system, include reflecting reduction masks, reflecting XUV projection optics and alignment systems, and surface-imaging photoresists. 52 refs., 7 figs.

  10. Online Monitoring of Laser-Generated XUV Radiation Spectra by Surface Reflectivity Measurements with Particle Detectors

    Directory of Open Access Journals (Sweden)

    Andreas Hoffmann

    2017-01-01

    Full Text Available In this contribution, we present a wavelength-sensitive method for the detection of extreme ultraviolet (XUV photon energies between 30 eV and 120 eV. The method is based on 45° reflectivity from either a cesium iodide-coated or an uncoated metal surface, which directs the XUV beam onto an electron or ion detector and its signal is used to monitor the XUV beam. The benefits of our approach are a spectrally sensitive diagnosis of the XUV radiation at the interaction place of time-resolved XUV experiments and the detection of infrared leak light though metal filters in high-harmonic generation (HHG experiments. Both features were tested using spectrally shaped XUV pulses from HHG in a capillary, and we have achieved excellent agreement with XUV spectrometer measurements and reflectivity calculations. Our obtained results are of interest for time-resolved XUV experiments presenting an additional diagnostic directly in the interaction region and for small footprint XUV beamline diagnostics.

  11. Noncollinear wave mixing of attosecond XUV and few-cycle optical laser pulses in gas-phase atoms: Toward multidimensional spectroscopy involving XUV excitations

    Science.gov (United States)

    Cao, Wei; Warrick, Erika R.; Fidler, Ashley; Neumark, Daniel M.; Leone, Stephen R.

    2016-11-01

    Ultrafast nonlinear spectroscopy, which records transient wave-mixing signals in a medium, is a powerful tool to access microscopic information using light sources in the radio-frequency and optical regimes. The extension of this technique towards the extreme ultraviolet (XUV) or even x-ray regimes holds the promise to uncover rich structural or dynamical information with even higher spatial or temporal resolution. Here, we demonstrate noncollinear wave mixing between weak XUV attosecond pulses and a strong near-infrared (NIR) few-cycle laser pulse in gas phase atoms (one photon of XUV and two photons of NIR). In the noncollinear geometry the attosecond and either one or two NIR pulses interact with argon atoms. Nonlinear XUV signals are generated in a spatially resolved fashion as required by phase matching. Different transition pathways can be identified from these background-free nonlinear signals according to the specific phase-matching conditions. Time-resolved measurements of the spatially gated XUV signals reveal electronic coherences of Rydberg wave packets prepared by a single XUV photon or XUV-NIR two-photon excitation, depending on the applied pulse sequences. These measurements open possible applications of tabletop multidimensional spectroscopy to the study of dynamics associated with valence or core excitation with XUV photons.

  12. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Plogmaker, S., E-mail: Stefan.Plogmaker@physics.uu.se, E-mail: Joachim.Terschluesen@physics.uu.se, E-mail: Johan.Soderstrom@physics.uu.se; Terschlüsen, J. A., E-mail: Stefan.Plogmaker@physics.uu.se, E-mail: Joachim.Terschluesen@physics.uu.se, E-mail: Johan.Soderstrom@physics.uu.se; Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J., E-mail: Stefan.Plogmaker@physics.uu.se, E-mail: Joachim.Terschluesen@physics.uu.se, E-mail: Johan.Soderstrom@physics.uu.se [Department of Physics and Astronomy, Molecular and Condensed Matter Physics, Uppsala University, P.O. Box 516, 75120 Uppsala (Sweden)

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  13. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    Science.gov (United States)

    Plogmaker, S.; Terschlüsen, J. A.; Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J.

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ṡ 1010 photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  14. HELIOS--A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy.

    Science.gov (United States)

    Plogmaker, S; Terschlüsen, J A; Krebs, N; Svanqvist, M; Forsberg, J; Cappel, U B; Rubensson, J-E; Siegbahn, H; Söderström, J

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20,000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10(10) photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  15. Adaptive multilayer optics for extreme ultraviolet wavelengths

    NARCIS (Netherlands)

    Bayraktar, Muharrem

    2015-01-01

    In this thesis we describe the development of a new class of optical components to enhance the imaging performance by enabling adaptations of the optics. When used at extreme ultraviolet (EUV) wavelengths, such ‘adaptive optics’ offers the potential to achieve the highest spatial resolution in imagi

  16. Compact XUV excimer radiation sources and their application

    Science.gov (United States)

    Fedenev, Andrei V.; Morozov, Andrei; Wieser, Jochen; Ulrich, Andreas

    2004-05-01

    Low energy electron beam excitation of dense helium and neon was used for light production in the extreme ultraviolet (XUV) wavelength range. The entire system was completely filled with the working gas avoiding the use of vacuum equipment for light production, propagation and detection. Emission spectra from He and Ne are dominated by the second continua with peak intensities at 80 and 83 nm, respectively. The hydrogen Lyman-α line was observed as the dominant impurity line. This XUV light source was used for transmission measurements of LiF near its absorption edge.

  17. The Space Density of Extended Ultraviolet (XUV) Disks in the Local Universe and Implications for Gas Accretion on to Galaxies

    CERN Document Server

    Lemonias, Jenna J; Thilker, David; Wyder, Ted K; Martin, D Christopher; Seibert, Mark; Treyer, Marie A; Bianchi, Luciana; Heckman, Timothy M; Madore, Barry F; Rich, R Michael

    2011-01-01

    We present results of the first unbiased search for extended UV (XUV)-disk galaxies undertaken to determine the space density of such galaxies. Our sample contains 561 local (0.001 1.5 x 10^4 s) and SDSS DR7 footprints. We explore modifications to the standard classification scheme for our sample that includes both disk- and bulge-dominated galaxies. Visual classification of each galaxy in the sample reveals an XUV-disk frequency of up to 20% for the most nearby portion of our sample. On average over the entire sample (out to z=0.05) the frequency ranges from a hard limit of 4% to 14%. The GALEX imaging allows us to detect XUV-disks beyond 100 Mpc. The XUV regions around XUV-disk galaxies are consistently bluer than the main bodies. We find a surprisingly high frequency of XUV emission around luminous red (NUV-r > 5) and green valley (3 1.5-4.2 x 10^-3 Mpc^-3. Using the XUV emission as an indicator of recent gas accretion, we estimate that the cold gas accretion rate onto these galaxies is > 1.7-4.6 x 10^-3...

  18. Internal frequency conversion extreme ultraviolet interferometer using mutual coherence properties of two high-order-harmonic sources

    Energy Technology Data Exchange (ETDEWEB)

    Dobosz, S.; Stabile, H.; Tortora, A.; Monot, P.; Reau, F.; Bougeard, M.; Merdji, H.; Carre, B.; Martin, Ph. [CEA, IRAMIS, Service des Photons Atomes et Molecules, F-91191 Gif- sur-Yvette (France); Joyeux, D.; Phalippou, D.; Delmotte, F.; Gautier, J.; Mercier, R. [Laboratoire Charles Fabry de l' Institut d' Optique, CNRS et Universite Paris Sud, Campus Polytechnique, RD 128, F-91127 Palaiseau cedex (France)

    2009-11-15

    We report on an innovative two-dimensional imaging extreme ultraviolet (XUV) interferometer operating at 32 nm based on the mutual coherence of two laser high order harmonics (HOH) sources, separately generated in gas. We give the first evidence that the two mutually coherent HOH sources can be produced in two independent spatially separated gas jets, allowing for probing centimeter-sized objects. A magnification factor of 10 leads to a micron resolution associated with a subpicosecond temporal resolution. Single shot interferograms with a fringe visibility better than 30% are routinely produced. As a test of the XUV interferometer, we measure a maximum electronic density of 3x10{sup 20} cm{sup -3} 1.1 ns after the creation of a plasma on aluminum target.

  19. The Stellar Extreme-Ultraviolet Radiation Field

    Science.gov (United States)

    Vallerga, John

    1998-04-01

    The local extreme ultraviolet (EUV) radiation field from stellar sources has been determined by combining the EUV spectra of 54 stars, taken with the spectrometers aboard the Extreme Ultraviolet Explorer satellite. The resultant spectrum over the range 70-730 Å is estimated to be 95% complete above 400 Å and 90% complete above 200 Å. The flux contributed by two B stars and three hot white dwarfs dominate the spectrum except at the shortest wavelengths, where an assortment of EUV source types contribute. The high electron densities measured toward nearby stars can be accounted for by photoionization from this radiation field, but the spectrum is too soft to explain the overionization of helium with respect to hydrogen recently measure in the Local Cloud.

  20. Laser-phase determination methods and transfer equations for direct temporal structure measurements of atto- and femtosecond XUV pulses

    Institute of Scientific and Technical Information of China (English)

    Ge Yu-Cheng

    2006-01-01

    In this paper the laser-phase determination methods and transfer equations are presented to directly reconstruct the detailed temporal structures of ultra-short extreme ultraviolet (xuv) pulses from the measured photoelectron energy spectra (PES). Each transfer equation includes one of PID (proportional-integral-differential) terms of PES. The intensity and instantaneous frequency of attosecond xuv can be retrieved from the integral term of PES. The intensity profiles of narrow bandwidth atto- and femtosecond xuvs can be rebuilt from the proportional and differential terms of PES respectively. The methods and equations 05 bc used to improve time resolutions in measuring ultrashort pulses.

  1. Gradient-based inverse extreme ultraviolet lithography.

    Science.gov (United States)

    Ma, Xu; Wang, Jie; Chen, Xuanbo; Li, Yanqiu; Arce, Gonzalo R

    2015-08-20

    Extreme ultraviolet (EUV) lithography is the most promising successor of current deep ultraviolet (DUV) lithography. The very short wavelength, reflective optics, and nontelecentric structure of EUV lithography systems bring in different imaging phenomena into the lithographic image synthesis problem. This paper develops a gradient-based inverse algorithm for EUV lithography systems to effectively improve the image fidelity by comprehensively compensating the optical proximity effect, flare, photoresist, and mask shadowing effects. A block-based method is applied to iteratively optimize the main features and subresolution assist features (SRAFs) of mask patterns, while simultaneously preserving the mask manufacturability. The mask shadowing effect may be compensated by a retargeting method based on a calibrated shadowing model. Illustrative simulations at 22 and 16 nm technology nodes are presented to validate the effectiveness of the proposed methods.

  2. Time resolved 3D momentum imaging of ultrafast dynamics by coherent VUV-XUV radiation

    Energy Technology Data Exchange (ETDEWEB)

    Sturm, F. P., E-mail: fpsturm@lbl.gov [Ultrafast X-Ray Science Lab, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Institut für Kernphysik, Universität Frankfurt, Max-von-Laue Str. 1, D-60438 Frankfurt (Germany); Wright, T. W.; Ray, D.; Zalyubovskaya, I.; Shivaram, N.; Slaughter, D. S.; Belkacem, A.; Weber, Th. [Ultrafast X-Ray Science Lab, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Ranitovic, P. [Ultrafast X-Ray Science Lab, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); ELI-ALPS, ELI-Hu Nkft, Dugonics ter 13, Szeged H6720 (Hungary)

    2016-06-15

    We present a new experimental setup for measuring ultrafast nuclear and electron dynamics of molecules after photo-excitation and ionization. We combine a high flux femtosecond vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) source with an internally cold molecular beam and a 3D momentum imaging particle spectrometer to measure electrons and ions in coincidence. We describe a variety of tools developed to perform pump-probe studies in the VUV-XUV spectrum and to modify and characterize the photon beam. First benchmark experiments are presented to demonstrate the capabilities of the system.

  3. Soft X ray/extreme ultraviolet images of the solar atmosphere with normal incidence multilayer optics

    Science.gov (United States)

    Lindblom, Joakim Fredrik

    The first high resolution Soft X-Ray/Extreme Ultraviolet (XUV) images of the Sun with normal incidence multilayer optics were obtained by the Standford/MSFC Rocket X-Ray Spectroheliograph on 23 Oct. 1987. Numerous images at selected wavelengths from 8 to 256 A were obtained simultaneously by the diverse array of telescopes flown on-board the experiment. These telescopes included single reflection normal incidence multilayer systems (Herschelian), double reflection multilayer systems (Cassegrain), a grazing incidence mirror system (Wolter-Schwarzschild), and hybrid systems using normal incidence multilayer optics in conjunction with the grazing incidence primary (Wolter-Cassegrain). Filters comprised of approximately 1700 A thick aluminum supported on a nickel mesh were used to transmit the soft x ray/EUV radiation while preventing the intense visible light emission of the Sun from fogging the sensitive experimental T-grain photographic emulsions. These systems yielded high resolution soft x ray/EUV images of the solar corona and transition region, which reveal magnetically confined loops of hot solar plasma, coronal plumes, polar coronal holes, supergranulation, and features associated with overlying cool prominences. The development, testing, and operation of the experiments, and the results from the flight are described. The development of a second generation experiment, the Multi-Spectral Solar Telescope Array, which is scheduled to fly in the summer of 1990, and a recently approved Space Station experiment, the Ultra-High Resolution XUV Spectroheliograph, which is scheduled to fly in 1996 are also described.

  4. Coherent Sources of XUV Radiation Soft X-Ray Lasers and High-Order Harmonic Generation

    CERN Document Server

    Jaeglé, Pierre

    2006-01-01

    Extreme ultraviolet radiation, also referred to as soft X-rays or XUV, offers very special optical properties. The X-UV refractive index of matter is such that normal reflection cannot take place on polished surfaces whereas beam transmission through one micrometer of almost all materials reduces to zero. Therefore, it has long been a difficult task to imagine and to implement devices designed for complex optics experiments in this wavelength range. Thanks to new sources of coherent radiation - XUV-lasers and High Order Harmonics - the use of XUV radiation, for interferometry, holography, diffractive optics, non-linear radiation-matter interaction, time-resolved study of fast and ultrafast phenomena and many other applications, including medical sciences, is ubiquitous.

  5. Absolute sensitivity calibration of extreme ultraviolet photoresists

    Energy Technology Data Exchange (ETDEWEB)

    Jones, Juanita; Naulleau, Patrick P.; Gullikson, Eric M.; Aquila, Andrew; George, Simi; Niakoula, Dimitra

    2008-05-16

    One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity, line-edge roughness, and resolution requirement. Sensitivity is of particular concern owing to its direct impact on source power requirements. Most current EUV exposure tools have been calibrated against a resist standard with the actual calibration of the standard resist dating back to EUV exposures at Sandia National Laboratories in the mid 1990s. Here they report on an independent sensitivity calibration of two baseline resists from the SEMATECH Berkeley MET tool performed at the Advanced Light Source Calibrations and Standards beamline. The results show the baseline resists to be approximately 1.9 times faster than previously thought based on calibration against the long standing resist standard.

  6. Photoresists in extreme ultraviolet lithography (EUVL)

    Science.gov (United States)

    De Simone, Danilo; Vesters, Yannick; Vandenberghe, Geert

    2017-06-01

    The evolutionary advances in photosensitive material technology, together with the shortening of the exposure wavelength in the photolithography process, have enabled and driven the transistor scaling dictated by Moore's law for the last 50 years. Today, the shortening wavelength trend continues to improve the chips' performance over time by feature size miniaturization. The next-generation lithography technology for high-volume manufacturing (HVM) is extreme ultraviolet lithography (EUVL), using a light source with a wavelength of 13.5 nm. Here, we provide a brief introduction to EUVL and patterning requirements for sub-0-nm feature sizes from a photomaterial standpoint, discussing traditional and novel photoresists. Emphasis will be put on the novel class of metal-containing resists (MCRs) as well as their challenges from a manufacturing prospective.

  7. Extreme ultraviolet spectral irradiance measurements since 1946

    Science.gov (United States)

    Schmidtke, G.

    2015-03-01

    In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial

  8. The Extreme Ultraviolet Variability of Quasars

    CERN Document Server

    Punsly, Brian; Zhang, Shaohua; Muzahid, Sowgat; O'Dea, Christopher P

    2016-01-01

    We study the extreme ultraviolet (EUV) variability (rest frame wavelengths 500 - 920 $\\AA$) of high luminosity quasars using HST (low to intermediate redshift sample) and SDSS (high redshift sample) archives. The combined HST and SDSS data indicates a much more pronounced variability when the sampling time between observations in the quasar rest frame is $> 2\\times 10^{7}$ sec compared to $2\\times 10^{7}$ sec in the quasar rest frame, $55\\%$ of the quasars (21/38) show evidence of EUV variability. The propensity for variability does not show any statistically significant change between $2.5\\times 10^{7}$ sec and $3.16\\times 10^{7}$ sec (1 yr). The temporal behavior is one of a threshold time interval for significant variability as opposed to a gradual increase on these time scales. A threshold time scale can indicate a characteristic spatial dimension of the EUV region. We explore this concept in the context of the slim disk models of accretion. We find that for rapidly spinning black holes, the radial infall...

  9. Terbium-based extreme ultraviolet multilayers.

    Science.gov (United States)

    Windt, David L; Seely, John F; Kjornrattanawanich, Benjawan; Uspenskii, Yu A

    2005-12-01

    We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC/Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si/Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100 degrees C (1 h) for Si/Tb. These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si/Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as O V near 63.0 nm and Mg X near 61.0 nm.

  10. Tomographic extreme-ultraviolet spectrographs: TESS.

    Science.gov (United States)

    Cotton, D M; Stephan, A; Cook, T; Vickers, J; Taylor, V; Chakrabarti, S

    2000-08-01

    We describe the system of Tomographic Extreme Ultraviolet (EUV) SpectrographS (TESS) that are the primary instruments for the Tomographic Experiment using Radiative Recombinative Ionospheric EUV and Radio Sources (TERRIERS) satellite. The spectrographs were designed to make high-sensitivity {80 counts/s)/Rayleigh [one Rayleigh is equivalent to 10(6) photons/(4pi str cm(2)s)}, line-of-sight measurements of the oi 135.6- and 91.1-nm emissions suitable for tomographic inversion. The system consists of five spectrographs, four identical nightglow instruments (for redundancy and added sensitivity), and one instrument with a smaller aperture to reduce sensitivity and increase spectral resolution for daytime operation. Each instrument has a bandpass of 80-140 nm with approximately 2- and 1-nm resolution for the night and day instruments, respectively. They utilize microchannel-plate-based two-dimensional imaging detectors with wedge-and-strip anode readouts. The instruments were designed, fabricated, and calibrated at Boston University, and the TERRIERS satellite was launched on 18 May 1999 from Vandenberg Air Force Base, California.

  11. An XUV source using a femtosecond enhancement cavity for photoemission spectroscopy

    Science.gov (United States)

    Mills, Arthur K.; Zhdanovich, Sergey; Sheyerman, Alex; Levy, Giorgo; Damascelli, Andrea; Jones, David J.

    2015-05-01

    Recent development of extreme ultraviolet (XUV) sources based on high harmonic generation (HHG) in femtosecond enhancement cavities (fsEC) has enabled generation of high photon ux ( ̴ 1013-1014 photons/sec) in the XUV, at high repetition rates (> 50 MHz) and spanning the spectral region from 40 nm - 120 nm. Here we demonstrate the potential offered by this approach for angle-resolved photoemission spectroscopy by measuring the photoemission spectrum of Au using 8.3 and 25 eV photons with excellent resolution at rapid data rates.

  12. Single-order laser high harmonics in XUV for ultrafast photoelectron spectroscopy of molecular wavepacket dynamics

    Directory of Open Access Journals (Sweden)

    Mizuho Fushitani

    2016-11-01

    Full Text Available We present applications of extreme ultraviolet (XUV single-order laser harmonics to gas-phase ultrafast photoelectron spectroscopy. Ultrashort XUV pulses at 80 nm are obtained as the 5th order harmonics of the fundamental laser at 400 nm by using Xe or Kr as the nonlinear medium and separated from other harmonic orders by using an indium foil. The single-order laser harmonics is applied for real-time probing of vibrational wavepacket dynamics of I2 molecules in the bound and dissociating low-lying electronic states and electronic-vibrational wavepacket dynamics of highly excited Rydberg N2 molecules.

  13. The Solar Extreme Ultraviolet Monitor for MAVEN

    Science.gov (United States)

    Eparvier, F. G.; Chamberlin, P. C.; Woods, T. N.; Thiemann, E. M. B.

    2015-12-01

    The Extreme Ultraviolet (EUV) monitor is an instrument on the NASA Mars Atmosphere and Volatile EvolutioN (MAVEN) mission, designed to measure the variability of the solar soft x-rays and EUV irradiance at Mars. The solar output in this wavelength range is a primary energy input to the Mars atmosphere and a driver for the processes leading to atmospheric escape. The MAVEN EUV monitor consists of three broadband radiometers. The radiometers consist of silicon photodiodes with different bandpass-limiting filters for each channel. The filters for the radiometers are: Channel A: thin foil C/Al/Nb/C for 0.1-3 nm and 17-22 nm, Channel B: thin foil C/Al/Ti/C for 0.1-7 nm, and Channel C: interference filter for 121-122 nm. A fourth, covered photodiode is used to monitor variations in dark signal due to temperature and radiation background changes. The three science channels will monitor emissions from the highly variable corona and transition region of the solar atmosphere. The EUV monitor is mounted on the top deck of the MAVEN spacecraft and is pointed at the Sun for most of its orbit around Mars. The measurement cadence is 1-second. The broadband irradiances can be used to monitor the most rapid changes in solar irradiance due to flares. In combination with time-interpolated observations at Earth of slower varying solar spectral emissions, the broadband MAVEN EUV monitor measurements will also be used in a spectral irradiance model to generate the full EUV spectrum at Mars from 0 to 190 nm in 1-nm bins on a time cadence of 1-minute and daily averages.

  14. The Extreme Ultraviolet Variability of Quasars

    Science.gov (United States)

    Punsly, Brian; Marziani, Paola; Zhang, Shaohua; Muzahid, Sowgat; O’Dea, Christopher P.

    2016-10-01

    We study the extreme ultraviolet (EUV) variability (rest frame wavelengths 500–920 Å) of high-luminosity quasars using Hubble Space Telescope (HST) (low to intermediate redshift sample) and Sloan Digital sky Survey (SDSS) (high redshift sample) archives. The combined HST and SDSS data indicates a much more pronounced variability when the sampling time between observations in the quasar rest frame is \\gt 2× {10}7 {{s}} compared to \\lt 1.5× {10}7 s. Based on an excess variance analysis, for time intervals \\lt 2× {10}7 {{s}} in the quasar rest frame, 10% of the quasars (4/40) show evidence of EUV variability. Similarly, for time intervals \\gt 2× {10}7 {{s}} in the quasar rest frame, 55% of the quasars (21/38) show evidence of EUV variability. The propensity for variability does not show any statistically significant change between 2.5× {10}7 {{s}} and 3.16× {10}7 {{s}} (1 year). The temporal behavior is one of a threshold time interval for significant variability as opposed to a gradual increase on these timescales. A threshold timescale can indicate a characteristic spatial dimension of the EUV region. We explore this concept in the context of the slim disk models of accretion. We find that for rapidly spinning black holes, the radial infall time to the plunge region of the optically thin surface layer of the slim disk that is responsible for the preponderance of the EUV flux emission (primarily within 0–7 black hole radii from the inner edge of the disk) is consistent with the empirically determined variability timescale.

  15. Observation of extremely strong shock waves in solids launched by petawatt laser heating

    Science.gov (United States)

    Lancaster, K. L.; Robinson, A. P. L.; Pasley, J.; Hakel, P.; Ma, T.; Highbarger, K.; Beg, F. N.; Chen, S. N.; Daskalova, R. L.; Freeman, R. R.; Green, J. S.; Habara, H.; Jaanimagi, P.; Key, M. H.; King, J.; Kodama, R.; Krushelnick, K.; Nakamura, H.; Nakatsutsumi, M.; MacKinnon, A. J.; MacPhee, A. G.; Stephens, R. B.; Van Woerkom, L.; Norreys, P. A.

    2017-08-01

    Understanding hydrodynamic phenomena driven by fast electron heating is important for a range of applications including fast electron collimation schemes for fast ignition and the production and study of hot, dense matter. In this work, detailed numerical simulations modelling the heating, hydrodynamic evolution, and extreme ultra-violet (XUV) emission in combination with experimental XUV images indicate shock waves of exceptional strength (200 Mbar) launched due to rapid heating of materials via a petawatt laser. We discuss in detail the production of synthetic XUV images and how they assist us in interpreting experimental XUV images captured at 256 eV using a multi-layer spherical mirror.

  16. Nonlinear Dichroism in Back-to-Back Double Ionization of He by an Intense Elliptically Polarized Few-Cycle Extreme Ultraviolet Pulse.

    Science.gov (United States)

    Ngoko Djiokap, J M; Manakov, N L; Meremianin, A V; Hu, S X; Madsen, L B; Starace, Anthony F

    2014-11-28

    Control of double ionization of He by means of the polarization and carrier-envelope phase (CEP) of an intense, few-cycle extreme ultraviolet (XUV) pulse is demonstrated numerically by solving the six-dimensional two-electron, time-dependent Schrödinger equation for He interacting with an elliptically polarized XUV pulse. Guided by perturbation theory (PT), we predict the existence of a nonlinear dichroic effect (∝I^{3/2}) that is sensitive to the CEP, ellipticity, peak intensity I, and temporal duration of the pulse. This dichroic effect (i.e., the difference of the two-electron angular distributions for opposite helicities of the ionizing XUV pulse) originates from interference of first- and second-order PT amplitudes, allowing one to probe and control S- and D-wave channels of the two-electron continuum. We show that the back-to-back in-plane geometry with unequal energy sharing is an ideal one for observing this dichroic effect that occurs only for an elliptically polarized, few-cycle attosecond pulse.

  17. A table-top monochromator for tunable femtosecond XUV pulses generated in a semi-infinite gas cell: Experiment and simulations.

    Science.gov (United States)

    von Conta, A; Huppert, M; Wörner, H J

    2016-07-01

    We present a new design of a time-preserving extreme-ultraviolet (XUV) monochromator using a semi-infinite gas cell as a source. The performance of this beamline in the photon-energy range of 20 eV-42 eV has been characterized. We have measured the order-dependent XUV pulse durations as well as the flux and the spectral contrast. XUV pulse durations of ≤40 fs using 32 fs, 800 nm driving pulses were measured on the target. The spectral contrast was better than 100 over the entire energy range. A simple model based on the strong-field approximation is presented to estimate different contributions to the measured XUV pulse duration. On-axis phase-matching calculations are used to rationalize the variation of the photon flux with pressure and intensity.

  18. Generation of an extreme ultraviolet supercontinuum with a multicycle chirped laser and a static electric field

    Institute of Scientific and Technical Information of China (English)

    Zhang Gang-Tai; Bai Ting-Ting; Zhang Mei-Guang

    2012-01-01

    We theoretically present a method for generating an ultrabroad extreme ultraviolet (XUV) supercontinuum by using the combination of a multicycle chirped laser and a static electric field.At a low laser intensity,the spectral cutoff is extended to the 495th order harmonic,and the bandwidth of the supercontinuum spectrum is broadened to 535 eV.At a high laser intensity,the harmonic cutoff is enlarged to the 667th order,and a supercontinuum covering a bandwidth of 1035 eV is generated.In these two cases,the long quantum path is removed,and the short quantum path is selected.Especially for the relatively high laser intensity,an isolated 23-attosecond pulse with a bandwidth of about 170.6 eV is directly obtained.Finally,we also analyze the influences of the chirp parameter and the duration of the chirped pulse as well as the static field strength on the supercontinuum.

  19. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    Energy Technology Data Exchange (ETDEWEB)

    Tanaka, Nozomi, E-mail: tanaka-n@ile.osaka-u.ac.jp; Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki [Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871 (Japan); Sunahara, Atsushi [Institute for Laser Technology, 2-6 Yamadaoka, Suita, Osaka 565-0871 (Japan)

    2015-09-14

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9–25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ∼10{sup 9 }W/cm{sup 2}. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  20. High Harmonic Generation XUV Spectroscopy for Studying Ultrafast Photophysics of Coordination Complexes

    Science.gov (United States)

    Ryland, Elizabeth S.; Lin, Ming-Fu; Verkamp, Max A.; Vura-Weis, Josh

    2016-06-01

    Extreme ultraviolet (XUV) spectroscopy is an inner shell technique that probes the M2,3-edge excitation of atoms. Absorption of the XUV photon causes a 3p→3d transition, the energy and shape of which is directly related to the element and ligand environment. This technique is thus element-, oxidation state-, spin state-, and ligand field specific. A process called high-harmonic generation (HHG) enables the production of ultrashort (≈20fs) pulses of collimated XUV photons in a tabletop instrument. This allows transient XUV spectroscopy to be conducted as an in-lab experiment, where it was previously only possible at accelerator-based light sources. Additionally, ultrashort pulses provide the capability for unprecedented time resolution (≈70fs IRF). This technique has the capacity to serve a pivotal role in the study of electron and energy transfer processes in materials and chemical biology. I will present the XUV transient absorption instrument we have built over the past two years, along with preliminary data and simulations of the M2,3-edge absorption data of a battery of small inorganic molecules to demonstrate the high specificity of this ultrafast tabletop technique.

  1. Absolute, Extreme-Ultraviolet, Solar Spectral Irradiance Monitor (AESSIM)

    Science.gov (United States)

    Huber, Martin C. E.; Smith, Peter L.; Parkinson, W. H.; Kuehne, M.; Kock, M.

    1988-01-01

    AESSIM, the Absolute, Extreme-Ultraviolet, Solar Spectral Irradiance Monitor, is designed to measure the absolute solar spectral irradiance at extreme-ultraviolet (EUV) wavelengths. The data are required for studies of the processes that occur in the earth's upper atmosphere and for predictions of atmospheric drag on space vehicles. AESSIM is comprised of sun-pointed spectrometers and newly-developed, secondary standards of spectral irradiance for the EUV. Use of the in-orbit standard sources will eliminate the uncertainties caused by changes in spectrometer efficiency that have plagued all previous measurements of the solar spectral EUV flux.

  2. Powerful 170-attosecond XUV pulses generated with few-cycle laser pulses and broadband multilayer optics

    Energy Technology Data Exchange (ETDEWEB)

    Schultze, M [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermannstrasse 1, D-85748 Garching (Germany); Goulielmakis, E [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermannstrasse 1, D-85748 Garching (Germany); Uiberacker, M [Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany); Hofstetter, M [Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany); Kim, J [Laser Science Laboratory, Department of Physics, POSTECH, Pohang, Kyungbuk 790-784 (Korea, Republic of); Kim, D [Laser Science Laboratory, Department of Physics, POSTECH, Pohang, Kyungbuk 790-784 (Korea, Republic of); Krausz, F [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermannstrasse 1, D-85748 Garching (Germany); Kleineberg, U [Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany)

    2007-07-15

    Single 170-as extreme ultraviolet (XUV) pulses delivering more than 10{sup 6} photons/pulse at {approx}100 eV at a repetition rate of 3 kHz are produced by ionizing neon with waveform-controlled sub-5 fs near-infrared (NIR) laser pulses and spectrally filtering the emerging near-cutoff high-harmonic continuum with a broadband, chirped multilayer molybdenum-silicon (Mo/Si) mirror.

  3. Extreme ultraviolet induced defects on few-layer graphene

    NARCIS (Netherlands)

    Gao, A.; Rizo, P. J.; Zoethout, E.; Scaccabarozzi, L.; Lee, C. J.; Banine, V.; F. Bijkerk,

    2013-01-01

    We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e., relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H2 background increases the graphene dosage sensitivity, du

  4. Defect formation in single layer graphene under extreme ultraviolet irradiation

    NARCIS (Netherlands)

    Gao, An; Zoethout, E.; Zoethout, E.; Sturm, Jacobus Marinus; Lee, Christopher James; Bijkerk, Frederik

    2014-01-01

    We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced chemical reactions between graphene and background residual gases, and breaking sp2 bonds, due to photon and/or photoele

  5. Graphene defect formation by extreme ultraviolet generated photoelectrons

    NARCIS (Netherlands)

    Gao, An; Lee, Christopher James; Bijkerk, Frederik

    2014-01-01

    We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy

  6. Graphene defect formation by extreme ultraviolet generated photoelectrons

    NARCIS (Netherlands)

    Gao, A.; Lee, C. J.; F. Bijkerk,

    2014-01-01

    We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy

  7. Vectorial diffraction of extreme ultraviolet light and ultrashort light pulses

    NARCIS (Netherlands)

    Nugrowati, A.M.

    2008-01-01

    In this thesis, we present applications in optics involving the diffraction theory of light for two advanced technologies. We have used a rigorous vectorial diffraction method to model: (i) the imaging of mask structures in extreme ultraviolet lithography, and (ii) ultrashort pulse propagation thro

  8. Telescience - Concepts and contributions to the Extreme Ultraviolet Explorer mission

    Science.gov (United States)

    Marchant, Will; Dobson, Carl; Chakrabarti, Supriya; Malina, Roger F.

    1987-01-01

    It is shown how the contradictory goals of low-cost and fast data turnaround characterizing the Extreme Ultraviolet Explorer (EUVE) mission can be achieved via the early use of telescience style transparent tools and simulations. The use of transparent tools reduces the parallel development of capability while ensuring that valuable prelaunch experience is not lost in the operations phase. Efforts made to upgrade the 'EUVE electronics' simulator are described.

  9. Extending Tabletop XUV Spectroscopy to the Liquid Phase to Examine Transition Metal Catalysts

    Science.gov (United States)

    Benke, Kristin; Ryland, Elizabeth S.; Vura-Weis, Josh

    2017-06-01

    M-edge spectroscopy of first row transition metals (3p to 3d excitation) is the low energy analogue of more well-known K- and L-edge spectroscopy, but can be implemented without the use of a synchrotron. Instead, M-edge spectroscopy can be performed as a tabletop method, relying on high harmonic generation (HHG) to produce ultrashort (˜ 20 fs) pulses of extreme ultraviolet (XUV) light in the range of 10-100s of eV. We have shown tabletop M-edge spectroscopy to be a valuable tool in determining the electronic structure of metal-centered coordination complexes and have demonstrated its capacity to yield element-specific information about a compound's oxidation state, spin state, and ligand field. The power of this technique to distinguish these features makes it a promising addition to the arsenal of methods used to study metal-centered catalysts. A catalytic reaction can be initiated photochemically and the XUV probe can be used to track oxidative and structural changes to identify the key intermediates. Until recently tabletop XUV spectroscopy has been performed on thin film samples, but in order to examine homogeneous catalysis, the technique must be adapted to look at samples in the liquid phase. The challenges of adapting tabletop XUV spectroscopy to the liquid phase lie in the lower attenuation length of XUV light compared to soft and hard x-rays and the lower flux compared to synchrotron methods. As a result, the sample must be limited to a sub-micron thickness as well as isolated from the vacuum environment required for x-ray spectroscopy. I am developing a liquid flow cell that relies on confining the sample between two x-ray transmissive SiN membranes, as has been demonstrated for use at synchrotrons, but adapted to the unique difficulties encountered in tabletop XUV spectroscopy.

  10. Extreme-Ultraviolet Vortices from a Free-Electron Laser

    Directory of Open Access Journals (Sweden)

    Primož Rebernik Ribič

    2017-08-01

    Full Text Available Extreme-ultraviolet vortices may be exploited to steer the magnetic properties of nanoparticles, increase the resolution in microscopy, and gain insight into local symmetry and chirality of a material; they might even be used to increase the bandwidth in long-distance space communications. However, in contrast to the generation of vortex beams in the infrared and visible spectral regions, production of intense, extreme-ultraviolet and x-ray optical vortices still remains a challenge. Here, we present an in-situ and an ex-situ technique for generating intense, femtosecond, coherent optical vortices at a free-electron laser in the extreme ultraviolet. The first method takes advantage of nonlinear harmonic generation in a helical undulator, producing vortex beams at the second harmonic without the need for additional optical elements, while the latter one relies on the use of a spiral zone plate to generate a focused, micron-size optical vortex with a peak intensity approaching 10^{14}  W/cm^{2}, paving the way to nonlinear optical experiments with vortex beams at short wavelengths.

  11. Extreme ultraviolet fluorescence spectroscopy of pure and core-shell rare gas clusters at FLASH

    Energy Technology Data Exchange (ETDEWEB)

    Schroedter, Lasse

    2013-08-15

    The interaction of rare gas clusters with short-wavelength radiation of free-electron lasers (FELs) has been studied extensively over the last decade by means of electron and ion time-of-flight spectroscopy. This thesis describes the design and construction of a fluorescence spectrometer for the extreme ultraviolet (XUV) spectral range and discusses the cluster experiments performed at FLASH, the Free-electron LAser in Hamburg. Fluorescence of xenon and of argon clusters was studied, both in dependence on the FEL pulse intensity and on the cluster size. The FEL wavelength was set to the giant 4d-resonance of xenon at 13.5 nm and the FEL pulse intensity reached peak values of 2.7.10{sup 15} W/cm{sup 2}. For xenon clusters, charge states of at least 11+ were identified. For argon, charge states up to 7+ were detected. The cluster-size dependent study revealed a decrease of the fluorescence yield per atom with increasing cluster size. This decrease is explained with the help of a geometric model. It assumes that virtually the entire fluorescence yield stems from shells of ions on the cluster surface, whereas ions in the cluster core predominantly recombine non-radiatively with electrons. However, the detailed analysis of fluorescence spectra from clusters consisting of a core of Xe atoms and a surrounding shell of argon atoms shows that, in fact, a small fraction of the fluorescence signal comes from Xe ions in the cluster core. Interestingly, these ions are as highly charged as the ions in the shells of a pure Xe cluster. This result goes beyond the current understanding of charge and energy transfer processes in these systems and points toward the observation of ultrafast charging dynamics in a time window where mass spectrometry is inherently blind. (orig.)

  12. Transient absorption and reshaping of ultrafast XUV light by laser-dressed helium

    CERN Document Server

    Gaarde, Mette B; Tate, Jennifer L; Schafer, Kenneth J

    2010-01-01

    We present a theoretical study of transient absorption and reshaping of extreme ultraviolet (XUV) pulses by helium atoms dressed with a moderately strong infrared (IR) laser field. We formulate the atomic response using both the frequency-dependent absorption cross section and a time-frequency approach based on the time-dependent dipole induced by the light fields. The latter approach can be used in cases when an ultrafast dressing pulse induces transient effects, and/or when the atom exchanges energy with multiple frequency components of the XUV field. We first characterize the dressed atom response by calculating the frequency-dependent absorption cross section for XUV energies between 20 and 24 eV for several dressing wavelengths between 400 and 2000 nm and intensities up to 10^12 W/cm^2. We find that for dressing wavelengths near 1600 nm, there is an Autler-Townes splitting of the 1s ---> 2p transition that can potentially lead to transparency for absorption of XUV light tuned to this transition. We study...

  13. Nano-antennae assisted emission of extreme ultraviolet radiation

    Energy Technology Data Exchange (ETDEWEB)

    Pfullmann, Nils; Noack, Monika; Cardoso de Andrade, Jose; Rausch, Stefan; Nagy, Tamas; Kovacev, Milutin [Leibniz Universitaet Hannover, Quantum Optics Institute (Germany); QUEST Centre for Quantum Engineering and Space-Time Research, Hannover (Germany); Reinhardt, Carsten [Laser Zentrum Hannover (Germany); Knittel, Vanessa; Bratschitsch, Rudolf; Leitenstorfer, Alfred [University of Konstanz, Department of Physics and Center for Applied Photonics (Germany); Akemeier, Dieter; Huetten, Andreas [Universitaet Bielefeld, AG Duenne Schichten Physik der Nanostrukturen (Germany); Morgner, Uwe [Leibniz Universitaet Hannover, Quantum Optics Institute (Germany); QUEST Centre for Quantum Engineering and Space-Time Research, Hannover (Germany); Laser Zentrum Hannover (Germany)

    2014-04-15

    High-order harmonic generation in xenon with oscillator repetition rates is studied. The necessary intensity is reached via plasmonic field enhancement at nanostructured arrays of bow-tie gold antennae. The theoretical analysis focuses on the thermal properties and the damage threshold of the bow-tie antennae. On the experimental side the number of contributing atoms is determined and optimized. Extreme ultraviolet radiation is successfully observed with photon fluxes almost an order of magnitude larger than previously reported. (copyright 2014 by WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  14. Characteristics of extreme ultraviolet emission from high-Z plasmas

    Science.gov (United States)

    Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

    2016-03-01

    We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

  15. Spectrophotometry of extreme helium stars - Ultraviolet fluxes and effective temperatures

    Science.gov (United States)

    Heber, U.; Drilling, J. S.; Schoenberner, D.; Lynas-Gray, A. E.

    1984-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broadband photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broadband photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K. Previously announced in STAR as N83-24433

  16. Feasibility of an XUV FEL Oscillator Driven by a SCRF Linear Accelerator

    Energy Technology Data Exchange (ETDEWEB)

    Lumpkin, A. H.; Freund, H. P.; Reinsch, M.

    2014-01-01

    The Advanced Superconducting Test Accelerator (ASTA) facility is currently under construction at Fermi National Accelerator Laboratory. Using a1-ms-long macropulse composed of up to 3000 micropulses, and with beam energies projected from 45 to 800 MeV, the possibility for an extreme ultraviolet (XUV) free-electron laser oscillator (FELO) with the higher energy is evaluated. We have used both GINGER with an oscillator module and the MEDUSA/OPC code to assess FELO saturation prospects at 120 nm, 40 nm, and 13.4 nm. The results support saturation at all of these wavelengths which are also shorter than the demonstrated shortest wavelength record of 176 nm from a storage-ring-based FELO. This indicates linac-driven FELOs can be extended into this XUV wavelength regime previously only reached with single-pass FEL configurations.

  17. Light field driven streak-camera for single-shot measurements of the temporal profile of XUV-pulses from a free-electron laser; Lichtfeld getriebene Streak-Kamera zur Einzelschuss Zeitstrukturmessung der XUV-Pulse eines Freie-Elektronen Lasers

    Energy Technology Data Exchange (ETDEWEB)

    Fruehling, Ulrike

    2009-10-15

    The Free Electron Laser in Hamburg (FLASH) is a source for highly intense ultra short extreme ultraviolet (XUV) light pulses with pulse durations of a few femtoseconds. Due to the stochastic nature of the light generation scheme based on self amplified spontaneous emission (SASE), the duration and temporal profile of the XUV pulses fluctuate from shot to shot. In this thesis, a THz-field driven streak-camera capable of single pulse measurements of the XUV pulse-profile has been realized. In a first XUV-THz pump-probe experiment at FLASH, the XUV-pulses are overlapped in a gas target with synchronized THz-pulses generated by a new THz-undulator. The electromagnetic field of the THz light accelerates photoelectrons produced by the XUV-pulses with the resulting change of the photoelectron momenta depending on the phase of the THz field at the time of ionisation. This technique is intensively used in attosecond metrology where near infrared streaking fields are employed for the temporal characterisation of attosecond XUV-Pulses. Here, it is adapted for the analysis of pulse durations in the few femtosecond range by choosing a hundred times longer far infrared streaking wavelengths. Thus, the gap between conventional streak cameras with typical resolutions of hundreds of femtoseconds and techniques with attosecond resolution is filled. Using the THz-streak camera, the time dependent electric field of the THz-pulses was sampled in great detail while on the other hand the duration and even details of the time structure of the XUV-pulses were characterized. (orig.)

  18. The Extreme Ultraviolet Spectra of Low Redshift Radio Loud Quasars

    CERN Document Server

    Punsly, Brian; Marziani, Paola; O'Dea, Christopher P

    2016-01-01

    This paper reports on the extreme ultraviolet (EUV) spectrum of three low redshift ($z \\sim 0.6$) radio loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph (COS) of the Hubble Space Telescope. The bolometric thermal emission, $L_{bol}$, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long term time averaged jet power, $\\overline{Q}$, for the three sources. $\\overline{Q}/L_{bol}$, is shown to lie along the correlation of $\\overline{Q}/L_{bol}$ and $\\alpha_{EUV}$ found in previous studies of the EUV continuum of intermediate and high redshift quasars, where the EUV continuum flux density between 1100 \\AA\\, and 700 \\AA\\, is defined by $F_{\

  19. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    Science.gov (United States)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-09

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  20. Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb

    CERN Document Server

    Zhang, Bosheng; Seaberg, Matthew H; Shanblatt, Elisabeth R; Porter, Christina L; Karl,, Robert; Mancuso, Christopher A; Kapteyn, Henry C; Murnane, Margaret M; Adams, Daniel E

    2016-01-01

    We demonstrate a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. It is enabled by applying ptychographical information multiplexing (PIM) to a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both the microscopy and the spectroscopy aspects. Besides the sample, the multicolor EUV beam is also imaged in situ, making our method a powerful beam characterization technique. No hardware is used to separate or narrow down the wavelengths, leading to efficient use of the EUV radiation.

  1. Method for the protection of extreme ultraviolet lithography optics

    Science.gov (United States)

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  2. Extreme Ultraviolet Transient Grating Spectroscopy of Vanadium Dioxide

    CERN Document Server

    Sistrunk, Emily; Jeong, Jaewoo; Samant, Mahesh G; Gray, Alexander X; Dürr, Hermann A; Parkin, Stuart S P; Gühr, Markus

    2014-01-01

    Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). We demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO2 film with EUV diffraction from the optically excited sample. The VO2 exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separate the two features.

  3. Experimental Comparison of Extreme-Ultraviolet Multilayers for Solar Physics

    Science.gov (United States)

    Windt, David L.; Donguy, Soizik; Seely, John; Kjornrattanawanich, Benjawan

    2004-03-01

    We compare the reflectance and stability of multilayers comprising either Si/Mo, Si/Mo2C, Si/B4C, Si/C, or Si/SiC bilayers, designed for use as extreme-ultraviolet (EUV) reflective coatings. The films were deposited by using magnetron sputtering and characterized by both x-ray and EUV reflectometry. We find that the new Si/SiC multilayer offers the greatest spectral selectivity at the longer wavelengths, as well as the greatest thermal stability. We also describe the optimization of multilayers designed for the Solar-B EIS instrument. Finally, we compare experimental reflectance data with calculations and conclude that currently available optical constants cannot be used to adequately model the performance of many of these multilayers.

  4. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    Science.gov (United States)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  5. Plans for the extreme ultraviolet explorer data base

    Science.gov (United States)

    Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

    1988-01-01

    The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

  6. Four-wave mixing experiments with extreme ultraviolet transient gratings.

    Science.gov (United States)

    Bencivenga, F; Cucini, R; Capotondi, F; Battistoni, A; Mincigrucci, R; Giangrisostomi, E; Gessini, A; Manfredda, M; Nikolov, I P; Pedersoli, E; Principi, E; Svetina, C; Parisse, P; Casolari, F; Danailov, M B; Kiskinova, M; Masciovecchio, C

    2015-04-09

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  7. Coherent control for the spherical symmetric box potential in short and intensive XUV laser fields

    CERN Document Server

    Barna, I F

    2007-01-01

    Coherent control calculations are presented for a spherically symmetric box potential for non-resonant two photon transition probabilities. With the help of a genetic algorithm (GA) the population of the excited states are maximized and minimized. The external driving field is a superposition of three intensive extreme ultraviolet (XUV) linearly polarized laser pulses with different frequencies in the femtosecond duration range. We solved the quantum mechanical problem within the dipole approximation. Our investigation clearly shows that the dynamics of the electron current has a strong correlation with the optimized and neutralizing pulse shape.

  8. Extreme ultraviolet lithography mask etch study and overview

    Science.gov (United States)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  9. High photon flux table-top coherent extreme ultraviolet source

    CERN Document Server

    Hädrich, Steffen; Rothhardt, Jan; Krebs, Manuel; Hoffmann, Armin; Pronin, Oleg; Pervak, Vladimir; Limpert, Jens; Tünnermann, Andreas

    2014-01-01

    High harmonic generation (HHG) enables extreme ultraviolet radiation with table-top setups. Its exceptional properties, such as coherence and (sub)-femtosecond pulse durations, have led to a diversity of applications. Some of these require a high photon flux and megahertz repetition rates, e.g. to avoid space charge effects in photoelectron spectroscopy. To date this has only been achieved with enhancement cavities. Here, we establish a novel route towards powerful HHG sources. By achieving phase-matched HHG of a megahertz fibre laser we generate a broad plateau (25 eV - 40 eV) of strong harmonics, each containing more than $10^{12}$ photons/s, which constitutes an increase by more than one order of magnitude in that wavelength range. The strongest harmonic (H25, 30 eV) has an average power of 143 $\\mu$W ($3\\cdot10^{13}$ photons/s). This concept will greatly advance and facilitate applications in photoelectron or coincidence spectroscopy, coherent diffractive imaging or (multidimensional) surface science.

  10. Multilayer coatings for optics in the extreme ultraviolet

    Science.gov (United States)

    Larruquert, Juan I.; Vidal-Dasilva, Manuela; García-Cortés, Sergio; Rodríguez-de Marcos, Luis; Fernández-Perea, Mónica; Aznárez, José A.; Méndez, José A.

    2011-02-01

    The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of efficient coatings. The development of novel coatings with improved EUV performance is presented. An extensive research was performed on the search and characterization of new materials with low absorption or high reflectance. Lanthanide series was found to be a source of materials with relatively low absorption in this range, where most materials in nature present a strong absorption. Other materials, such as SiO and B, have been found to have interesting properties for applications on EUV coatings. As a result, novel multilayers based on Yb, Al, and SiO have been developed with narrowband performance in the 50-92 nm range. In some cases, the difficulty of developing narrowband coatings in the EUV can be overcome by designing multilayers that address specific purposes, such as maximizing and/or minimizing the reflectance at two or more wavelengths or bands. In this direction, we are working towards the development of coatings that combine a relatively high reflectance in a desired EUV band with a low reflectance in another band, for applications in which the presence of the latter radiation may mask a weak EUV radiation source.

  11. Kr photoionized plasma induced by intense extreme ultraviolet pulses

    Science.gov (United States)

    Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

    2016-04-01

    Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

  12. Extreme ultraviolet spectroscopy of low pressure helium microwave driven discharges

    Science.gov (United States)

    Espinho, Susana; Felizardo, Edgar; Tatarova, Elena; Alves, Luis Lemos

    2016-09-01

    Surface wave driven discharges are reliable plasma sources that can produce high levels of vacuum and extreme ultraviolet radiation (VUV and EUV). The richness of the emission spectrum makes this type of discharge a possible alternative source in EUV/VUV radiation assisted applications. However, due to challenging experimental requirements, publications concerning EUV radiation emitted by microwave plasmas are scarce and a deeper understanding of the main mechanisms governing the emission of radiation in this spectral range is required. To this end, the EUV radiation emitted by helium microwave driven plasmas operating at 2.45 GHz has been studied for low pressure conditions. Spectral lines from excited helium atoms and ions were detected via emission spectroscopy in the EUV/VUV regions. Novel data concerning the spectral lines observed in the 23 - 33 nm wavelength range and their intensity behaviour with variation of the discharge operational conditions are presented. The intensity of all the spectral emissions strongly increases with the microwave power delivered to the plasma up to 400 W. Furthermore, the intensity of all the ion spectral emissions in the EUV range decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar. Work funded by FCT - Fundacao para a Ciencia e a Tecnologia, under Project UID/FIS/50010/2013 and grant SFRH/BD/52412/2013 (PD-F APPLAuSE).

  13. Four-mirror extreme ultraviolet (EUV) lithography projection system

    Science.gov (United States)

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  14. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    Science.gov (United States)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  15. Low extreme-ultraviolet luminosities impinging on protoplanetary disks

    Energy Technology Data Exchange (ETDEWEB)

    Pascucci, I.; Hendler, N. P. [Lunar and Planetary Laboratory, The University of Arizona, Tucson, AZ 85721 (United States); Ricci, L. [Department of Astronomy, California Institute of Technology, MC 249-17, Pasadena, CA 91125 (United States); Gorti, U.; Hollenbach, D. [SETI Institute, 189 Bernardo Ave., Mountain View, CA 94043 (United States); Brooks, K. J.; Contreras, Y., E-mail: pascucci@lpl.arizona.edu [Australia Telescope National Facility, P.O. Box 76, Epping, NSW 1710 (Australia)

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (∼2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 10{sup 42} photons s{sup –1} for all sources without jets and lower than 5 × 10{sup 40} photons s{sup –1} for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  16. All-reflection interferometer for extreme-ultraviolet airglow studies

    Science.gov (United States)

    Cotton, Daniel M.; Chakrabarti, Supriya

    1993-12-01

    We describe a possible sounding rocket payload consisting of an interferometer that would observe O I 1304 equals angstroms solar and airglow emissions simultaneously and a low-resolution (15-angstroms) extreme ultraviolet (EUV) spectrometer with a band pass between 250 and 1050 angstroms to measure the solar EUV flux, a primary source for the O I 1304-angstroms dayglow emission. The solar measurements, the first of their kind, could provide detailed information on the column of O along the line of sight of the instrument as well as information on the full disk solar line profile, which is important to planetary as well as cometary physics. The information gained through line profile studies of the dayglow includes the relative contribution of the two main excitation mechanisms, photoelectron impact and solar resonance scattering, and a means to verify cross sections and branching ratios. All such information will substantiate sophisticated models, electron and radiative transport, that can be utilized in the remote sensing of the thermosphere.

  17. Reconstruction of Solar Extreme Ultraviolet Flux 1740-2015

    CERN Document Server

    Svalgaard, Leif

    2015-01-01

    Solar Extreme Ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo ionization of molecular Oxygen. Solar heating of the ionosphere creates thermal winds which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and sets with the Sun and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us the deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the 'Magnetic Crusade' of the 1830s and less reliable, but still usable, data are available for portions of the hundred years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to t...

  18. Ablation of Submicrometer Holes Using an Extreme-Ultraviolet Laser

    Science.gov (United States)

    Rossall, Andrew K.; Aslanyan, Valentin; Tallents, Greg J.; Kuznetsov, Ilya; Rocca, Jorge J.; Menoni, Carmen S.

    2015-06-01

    Simulations and experiments are used to study extreme-ultraviolet (EUV) laser drilling of submicrometer holes. The ablation process is studied with a 2D Eulerian hydrodynamic code that includes bound-free absorption processes relevant to the interaction of EUV lasers with a solid material. Good agreement is observed between the simulated and measured ablated depths for on-target irradiances of up to 1×10 10 W cm-2 . An increase in the irradiance to 1×10 12 W cm-2 is predicted to ablate material to a depth of 3.8 μ m from a single pulse with a hole diameter 3 to 4 times larger than the focal spot size. The model allows for the simulation of the interaction of a laser pulse with the crater created by a previous shot. Multiple-pulse lower-fluence irradiation configurations under optimized focusing conditions, i.e., approaching the diffraction limit, are shown to be advantageous for applications requiring mesoscale [(100 nm )- (1 μ m ) ] features and a high level of control over the ablation profile.

  19. Solar XUV and ENA-driven water loss from early Venus' steam atmosphere

    Science.gov (United States)

    Lichtenegger, H. I. M.; Kislyakova, K. G.; Odert, P.; Erkaev, N. V.; Lammer, H.; Gröller, H.; Johnstone, C. P.; Elkins-Tanton, L.; Tu, L.; Güdel, M.; Holmström, M.

    2016-05-01

    We present a study on the influence of the upper atmosphere hydrodynamic escape of hydrogen, driven by the solar soft X-ray and extreme ultraviolet radiation (XUV), on an expected outgassed steam atmosphere of early Venus. By assuming that the young Sun was either a weak or moderately active young G star, we estimated the water loss from a hydrogen dominated thermosphere due to the absorption of the solar XUV flux and the precipitation of solar wind produced energetic hydrogen atoms (ENAs). The production of ENAs and their interaction with the hydrodynamic extended upper atmosphere, including collision-related feedback processes, have been calculated by means of Monte Carlo models. ENAs that collide in the upper atmosphere deposit their energy and heat the surrounding atmosphere mainly above the main XUV energy deposition layer. It is shown that precipitating ENAs modify the thermal structure of the upper atmosphere, but the enhancement of the thermal escape rates caused by these energetic hydrogen atoms is negligible. Our results also indicate that the majority of oxygen arising from dissociated H2O molecules is left behind during the first 100 Myr. It is thus suggested that the main part of the remaining oxygen has been absorbed by crustal oxidation.

  20. Extreme ultraviolet (EUV) and FUV calibration facility for special sensor ultraviolet limb imager (SSULI)

    Science.gov (United States)

    Boyer, Craig N.; Osterman, Steven N.; Thonnard, Stefan E.; McCoy, Robert P.; Williams, J. Z.; Parker, S. E.

    1994-09-01

    A facility for calibrating far ultraviolet and extreme ultraviolet instruments has recently been completed at the Naval Research Laboratory. Our vacuum calibration vessel is 2-m in length, 1.67-m in diameter, and can accommodate optical test benches up to 1.2-m wide by 1.5-m in length. A kinematically positioned frame with four axis precision pointing capability of 10 microns for linear translation and .01 degrees for rotation is presently used during vacuum optical calibration of SSULI. The chamber was fabricated from 304 stainless steel and polished internally to reduce surface outgassing. A dust-free environment is maintained at the rear of the vacuum chamber by enclosing the 2-m hinged vacuum access door in an 8 ft. by 8 ft. class 100 clean room. Every effort was made to obtain an oil-free environment within the vacuum vessel. Outgassing products are continually monitored with a 1 - 200 amu residual gas analyzer. An oil-free claw and vane pump evacuates the chamber to 10-2 torr through 4 in. diameter stainless steel roughing lines. High vacuum is achieved and maintained with a magnetically levitated 480 l/s turbo pump and a 3000 l/s He4 cryopump. Either of two vacuum monochrometers, a 1-m f/10.4 or a 0.2-m f/4.5 are coaxially aligned with the optical axis of the chamber and are used to select single UV atomic resonance lines from a windowless capillary or penning discharge UV light source. A calibrated channeltron detector is coaxially mounted with the SSULI detector during calibration. All vacuum valves, the cooling system for the cryopump compressor, and the roughing pump are controlled through optical fibers which are interfaced to a computer through a VME board. Optical fibers were chosen to ensure that complete electrical isolation is maintained between the computer and the vacuum system valves-solenoids and relays.

  1. Multilayer coatings for the far and extreme ultraviolet

    Science.gov (United States)

    Larruquert, Juan I.; Vidal-Dasilva, Manuela; García-Cortés, Sergio; Rodríguez-de Marcos, Luis; Fernández-Perea, Mónica; Aznárez, José A.; Méndez, José A.

    2011-05-01

    We present the development of novel coatings for the far and extreme ultraviolet (FUV-EUV). In the EUV above ~50 nm, the strong absorption of materials has precluded the development of narrowband coatings. An extensive research has been performed on the search and characterization of new materials with low absorption; the lanthanide series has been found to be a source of materials with relatively low absorption in the range of interest. The discovery of a wealth of materials with relatively low EUV absorption is basic to develop efficient multilayers, particularly with narrowband properties. In this way, we have developed multilayers based on Yb, Al, and SiO with narrowband performance in the 50-92 nm range; these are first narrowband coatings peaked above 70 nm. Our recent research on multilayers based on Eu, Al, and SiO provide promising results, with an increase in the peak reflectance versus Yb/Al/SiO multilayers, along with a peak wavelength that can be extended up to ~100 nm. For applications where FUV-EUV narrowband coatings have not been able to be prepared, we can design multilayers that address specific purposes, such as maximizing the reflectance ratio at two wavelengths or bands. Our first goal in this direction is the development of coatings with high 102.6 nm/ 121.6 nm reflectance ratio. Calculations predict that a high reflectance at Lyman β with a good rejection at Lyman α can be obtained through multilayer coatings. We are at the beginning of experimental research for this goal.

  2. Four wave mixing experiments with extreme ultraviolet transient gratings

    Science.gov (United States)

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-01-01

    Four wave mixing (FWM) processes, based on third-order non-linear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enables to explore dynamics inaccessible by linear methods.1-7 The coherent and multi-wave nature of FWM approach has been crucial in the development of cutting edge technologies, such as silicon photonics,8 sub-wavelength imaging9 and quantum communications.10 All these technologies operate with optical wavelengths, which limit the spatial resolution and do not allow probing excitations with energy in the eV range. The extension to shorter wavelengths, that is the extreme ultraviolet (EUV) and soft-x-ray (SXR) range, will allow to improve the spatial resolution and to expand the excitation energy range, as well as to achieve elemental selectivity by exploiting core resonances.5-7,11-14 So far FWM applications at these wavelengths have been prevented by the absence of coherent sources of sufficient brightness and suitable experimental setups. Our results show how transient gratings, generated by the interference of coherent EUV pulses delivered by the FERMI free electron laser (FEL),15 can be used to stimulate FWM processes at sub-optical wavelengths. Furthermore, we have demonstrated the possibility to read the time evolution of the FWM signal, which embodies the dynamics of coherent excitations as molecular vibrations. This result opens the perspective for FWM with nanometer spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics.5-7 The theoretical possibility to realize these applications have already stimulated dedicated and ongoing FEL developments;16-20 today our results show that FWM at sub-optical wavelengths is feasible and would be the spark to the further advancements of the present and new sources. PMID:25855456

  3. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    Science.gov (United States)

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination.

  4. Solar extreme ultraviolet sensor and advanced langmuir probe

    Science.gov (United States)

    Voronka, N. R.; Block, B. P.; Carignan, G. R.

    1992-01-01

    For more than two decades, the staff of the Space Physics Research Laboratory (SPRL) has collaborated with the Goddard Space Flight Center (GSFC) in the design and implementation of Langmuir probes (LP). This program of probe development under the direction of Larry Brace of GSFC has evolved methodically with innovations to: improve measurement precision, increase the speed of measurement, and reduce the weight, size, power consumption and data rate of the instrument. Under contract NAG5-419 these improvements were implemented and are what characterize the Advanced Langmuir Probe (ALP). Using data from the Langmuir Probe on the Pioneer Venus Orbiter, Brace and Walter Hoegy of GSFC demonstrated a novel method of monitoring the solar extreme ultraviolet (EUV) flux. This led to the idea of developing a sensor similar to a Langmuir probe specifically designed to measure solar EUV (SEUV) that uses a similar electronics package. Under this contract, a combined instrument package of the ALP and SEUV sensor was to be designed, constructed, and laboratory tested. Finally the instrument was to be flight tested as part of sounding rocket experiment to acquire the necessary data to validate this method for possible use in future earth and planetary aeronomy missions. The primary purpose of this contract was to develop the electronics hardware and software for this instrument, since the actual sensors were suppied by GSFC. Due to budget constraints, only a flight model was constructed. These electronics were tested and calibrated in the laboratory, and then the instrument was integrated into the rocket payload at Wallops Flight Facility where it underwent environmental testing. After instrument recalibration at SPRL, the payload was reintegrated and launched from the Poker Flat Research Range near Fairbanks Alaska. The payload was successfully recovered and after refurbishment underwent further testing and developing to improve its performance for future use.

  5. Kinematics and amplitude evolution of global coronal extreme ultraviolet waves

    Institute of Scientific and Technical Information of China (English)

    Ting Li; Jun Zhang; Shu-Hong Yang; Wei Liu

    2012-01-01

    With the observations of the Solar-Terrestrial Relations Observatory (STEREO) and the Solar Dynamics Observatory (SDO),we analyze in detail the kinematics of global coronal waves together with their intensity amplitudes (so-called "perturbation profiles").We use a semi-automatic method to investigate the perturbation profiles of coronal waves.The location and amplitude of the coronal waves are calculated over a 30° sector on the sphere,where the wave signal is strongest.The position with the strongest perturbation at each time is considered as the location of the wave front.In all four events,the wave velocities vary with time for most of their lifetime,up to 15 min,while in the event observed by the Atmospheric Imaging Assembly there is an additional early phase with a much higher velocity.The velocity varies greatly between different waves from 216 to 440 km s-1.The velocity of the two waves initially increases,subsequently decreases,and then increases again.Two other waves show a deceleration followed by an acceleration.Three categories of amplitude evolution of global coronal waves are found for the four events.The first is that the amplitude only shows a decrease.The second is that the amplitude initially increases and then decreases,and the third is that the amplitude shows an orderly increase,a decrease,an increase again and then a decrease.All the extreme ultraviolet waves show a decrease in amplitude while propagating farther away,probably because the driver of the global coronal wave (coronal mass ejection) is moving farther away from the solar surface.

  6. Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

    Science.gov (United States)

    Svalgaard, Leif

    2016-11-01

    Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

  7. Extreme ultraviolet lithography: A few more pieces of the puzzle

    Energy Technology Data Exchange (ETDEWEB)

    Anderson, Christopher N. [Univ. of California, Berkeley, CA (United States)

    2009-05-20

    The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this

  8. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    Science.gov (United States)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  9. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Hong; Duan, Lian; Lan, Hui [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); Wang, Xinbing, E-mail: xbwang@hust.edu.cn; Chen, Ziqi; Zuo, Duluo [Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); Lu, Peixiang [School of Physics, Huazhong University of Science and Technology, Wuhan 430074 (China)

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  10. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    Science.gov (United States)

    Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

    2010-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  11. Extremely Nonlinear Optics Using Shaped Pulses Spectrally Broadened in an Argon- or Sulfur Hexafluoride-Filled Hollow-Core Fiber

    Directory of Open Access Journals (Sweden)

    Andreas Hoffmann

    2015-11-01

    Full Text Available In this contribution we present a comparison of the performance of spectrally broadened ultrashort pulses using a hollow-core fiber either filled with argon or sulfur hexafluoride (SF6 for demanding pulse-shaping experiments. The benefits of both gases for pulse-shaping are studied in the highly nonlinear process of high-harmonic generation. In this setup, temporally shaping the driving laser pulse leads to spectrally shaping of the output extreme ultraviolet (XUV spectrum, where total yield and spectral selectivity in the XUV are the targets of the optimization approach. The effect of using sulfur hexafluoride for pulse-shaping the XUV yield can be doubled compared to pulse compression and pulse-shaping using argon and the spectral range for selective optimization of a single harmonic can be extended. The obtained results are of interest for extending the range of ultrafast science applications drawing on tailored XUV fields.

  12. Testing of Radiation Hardness in the Extreme-Ultraviolet Spectral Region

    Science.gov (United States)

    Arp, U.; Ermanoski, I.; Tarrio, C.; Grantham, S.; Hill, S.; Dhez, P.; Lucatorto, T. B.

    2007-01-01

    Currently we are commissioning a second multilayer-based beamline to study the radiation hardness of multilayers under extreme-ultraviolet (EUV) irradiation in an oxidizing atmosphere. Multilayer lifetime is one of the most important issues for the commercialization of extreme-ultraviolet lithography. The beamline employs a spherical multilayer mirror and a beryllium filter. The mirror demagnifies the source and reflects 13.4 nm radiation as well as visible light. The beryllium filter suppresses the visible light reflected by the mirror and provides also a barrier between the extremely clean storage ring vacuum and the water atmosphere of the test chamber.

  13. Towards Extremely Sensitive Ultraviolet-Light Sensors Employing Photochromic Optical Microfiber

    Directory of Open Access Journals (Sweden)

    George Y. Chen

    2015-01-01

    Full Text Available We propose an extremely responsive ultraviolet-light sensor (−1.39 × 106 dB/(W/cm2 based on photochromic optical microfiber. A densely packed planar coil of ZBLAN optical microfiber is doped with photochromic dyes. Under ultraviolet radiation, the photochromic microfiber experiences temporary photodarkening, and the change in the transmission of the probe light provides a measure of the incident ultraviolet light. This novel design grants an enhancement in sensitivity (3.13 nW/cm2 by at least one order of magnitude compared to traditional electrical counterparts.

  14. Optical Observation of the Ionospheric-Magnetospheric Outflowing Oxygen Ions by XUV Onboard Sounding Rocket SS-520-2

    Science.gov (United States)

    Tashiro, S.; Yamazaki, A.; Yoshikawa, I.; Takizawa, Y.; Miyake, W.; Endo, M.; Nakamura, M.

    2001-12-01

    We built the Extreme ultraviolet scanner (XUV) for imaging oxygen ions to outflow from the polar ionosphere into the magnetosphere. The XUV onboard a sounding rocket SS-520-2 imaged the oxygen ions above 1000 km altitude near the polar cusp on December 4, 2000. The XUV is a normal incidence telescope that has a peak sensitivity at the wavelength 83.4 [nm] of OII emission and consists of a Mo coated mirror, a band pass filter and a channel electron multiplier. The band pass filter selectively transmits OII emission and eliminates background emissions such as HeI emission at the 30.4 [nm], HeII emission at the 58.4 [nm], and HI emission at the 121.6 [nm]. The observed OII emission intensity is proportional to the ion density integrated along the line of sight. Therefore The observed OII emission intensity distribution makes possible to determine the oxygen ion distribution. We will present the oxygen ion distribution and discuss the process and quantity of that ionospheric oxygen ions outflow into the magnetosphere.

  15. High Intensity Femtosecond XUV Pulse Interactions with Atomic Clusters: Final Report

    Energy Technology Data Exchange (ETDEWEB)

    Ditmire, Todd [Univ. of Texas, Austin, TX (United States). Center for High Energy Density Science

    2016-10-12

    We propose to expand our recent studies on the interactions of intense extreme ultraviolet (XUV) femtosecond pulses with atomic and molecular clusters. The work described follows directly from work performed under BES support for the past grant period. During this period we upgraded the THOR laser at UT Austin by replacing the regenerative amplifier with optical parametric amplification (OPA) using BBO crystals. This increased the contrast of the laser, the total laser energy to ~1.2 J , and decreased the pulse width to below 30 fs. We built a new all reflective XUV harmonic beam line into expanded lab space. This enabled an increase influence by a factor of 25 and an increase in the intensity by a factor of 50. The goal of the program proposed in this renewal is to extend this class of experiments to available higher XUV intensity and a greater range of wavelengths. In particular we plan to perform experiments to confirm our hypothesis about the origin of the high charge states in these exploding clusters, an effect which we ascribe to plasma continuum lowering (ionization potential depression) in a cluster nano-­plasma. To do this we will perform experiments in which XUV pulses of carefully chosen wavelength irradiate clusters composed of only low-Z atoms and clusters with a mixture of this low-­Z atom with higher Z atoms. The latter clusters will exhibit higher electron densities and will serve to lower the ionization potential further than in the clusters composed only of low Z atoms. This should have a significant effect on the charge states produced in the exploding cluster. We will also explore the transition of explosions in these XUV irradiated clusters from hydrodynamic expansion to Coulomb explosion. The work proposed here will explore clusters of a wider range of constituents, including clusters from solids. Experiments on clusters from solids will be enabled by development we performed during the past grant period in which we constructed and

  16. A beamline for time-resolved extreme ultraviolet and soft x-ray spectroscopy

    CERN Document Server

    Grilj, Jakob; Koch, Markus; Gühr, Markus

    2013-01-01

    High harmonic generation is a convenient way to obtain extreme ultraviolet light from table-top laser systems and the experimental tools to exploit this simple and powerful light source for time-resolved spectroscopy are being developed by several groups. For these applications, brightness and stability of the high harmonic generation is a key feature. This article focuses on practical aspects in the generation of extreme ultraviolet pulses with ultrafast commercial lasers, namely generation parameters and online monitoring as well as analysis of generation yield and stability.

  17. XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets

    Science.gov (United States)

    Barte, Ellie Floyd; Lokasani, Ragava; Proska, Jan; Stolcova, Lucie; Maguire, Oisin; Kos, Domagoj; Sheridan, Paul; O'Reilly, Fergal; Sokell, Emma; McCormack, Tom; O'Sullivan, Gerry; Dunne, Padraig; Limpouch, Jiri

    2017-05-01

    Laser-produced plasmas are intense sources of XUV radiation that can be suitable for different applications such as extreme ultraviolet lithography, beyond extreme ultraviolet lithography and water window imaging. In particular, much work has focused on the use of tin plasmas for extreme ultraviolet lithography at 13.5 nm. We have investigated the spectral behavior of the laser produced plasmas formed on closely packed polystyrene microspheres and porous alumina targets covered by a thin tin layer in the spectral region from 2.5 to 16 nm. Nd:YAG lasers delivering pulses of 170 ps (Ekspla SL312P )and 7 ns (Continuum Surelite) duration were focused onto the nanostructured targets coated with tin. The intensity dependence of the recorded spectra was studied; the conversion efficiency (CE) of laser energy into the emission in the 13.5 nm spectral region was estimated. We have observed an increase in CE using high intensity 170 ps Nd:YAG laser pulses as compared with a 7 ns pulse.

  18. Network search method in the design of extreme ultraviolet lithographic objectives

    NARCIS (Netherlands)

    Marinescu, O.; Bociort, F.

    2007-01-01

    The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs

  19. Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

    NARCIS (Netherlands)

    Dolgov, A.; Yakushev, O.; Abrikosov, A.; Snegirev, E.; Krivtsun, V.M.; Lee, C.J.; Bijkerk, F.

    2015-01-01

    An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and

  20. Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry

    NARCIS (Netherlands)

    Chen, J. Q.; E. Louis,; Wormeester, H.; Harmsen, R.; van de Kruijs, R.; Lee, C. J.; van Schaik, W.; F. Bijkerk,

    2011-01-01

    Carbon deposition on extreme ultraviolet (EUV) optics was observed due to photon-induced dissociation of hydrocarbons in a EUV lithography environment. The reflectance loss of the multilayer mirror is determined by the carbon layer thickness and density. To study the influence of various forms of ca

  1. Ion-beam-deposited boron carbide coatings for the extreme ultraviolet.

    Science.gov (United States)

    Blumenstock, G M; Keski-Kuha, R A

    1994-09-01

    The normal-incidence reflectance of ion-beam-deposited boron carbide thin films has been evaluated in the extreme ultraviolet (EUV) spectral region. High-reflectance coatings have been produced with reflectances greater than 30% between 67 and 121.6 nm. This high reflectance makes ion-beam-deposited boron carbide an attractive coating for EUV applications.

  2. Soft X-rays and extreme ultraviolet radiation principles and applications

    CERN Document Server

    Attwood, David

    1999-01-01

    This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.

  3. Narrowband and tunable anomalous transmission filters for special monitoring in the extreme ultraviolet wavelength region

    NARCIS (Netherlands)

    Barreaux, J.L.P.; Kozhevnikov, I.V.; Bayraktar, Muharrem; van de Kruijs, Robbert Wilhelmus Elisabeth; Bastiaens, Hubertus M.J.; Bijkerk, Frederik; Boller, Klaus J.

    2017-01-01

    We present the first experimental demonstration of a novel type of narrowband and wavelength-tunable multilayer transmission filter for the extreme ultraviolet (EUV) region. The operating principle of the filter is based on spatially overlapping the nodes of a standing wave field with the absorbing

  4. Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair

    NARCIS (Netherlands)

    Gonzalez, Carlos M.; Timilsina, Rajendra; Li, Guoliang; Duscher, Gerd; Rack, Philip D.; Slingenbergh, Winand; van Dorp, Willem F.; De Hosson, Jeff T. M.; Klein, Kate L.; Wu, Huimeng M.; Stern, Lewis A.

    2014-01-01

    The gas field ion microscope was used to investigate helium and neon ion beam induced etching of nickel as a candidate technique for extreme ultraviolet (EUV) lithography mask editing. No discernable nickel etching was observed for room temperature helium exposures at 16 and 30 keV in the dose range

  5. EUV SpectroPhotometer (ESP) in Extreme Ultraviolet Variability Experiment (EVE): Algorithms and Calibrations

    CERN Document Server

    Didkovsky, Leonid; Wieman, Seth; Woods, Tom; Jones, Andrew

    2009-01-01

    The Extreme ultraviolet SpectroPhotometer (ESP) is one of five channels of the Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO). The ESP channel design is based on a highly stable diffraction transmission grating and is an advanced version of the Solar Extreme ultraviolet Monitor (SEM), which has been successfully observing solar irradiance onboard the Solar and Heliospheric Observatory (SOHO) since December 1995. ESP is designed to measure solar Extreme UltraViolet (EUV) irradiance in four first order bands of the diffraction grating centered around 19 nm, 25 nm, 30 nm, and 36 nm, and in a soft X-ray band from 0.1 to 7.0 nm in the zeroth order of the grating. Each band's detector system converts the photo-current into a count rate (frequency). The count rates are integrated over 0.25 sec increments and transmitted to the EVE Science and Operations Center for data processing. An algorithm for converting the measured count rates into solar irradiance and the ES...

  6. Comparing Vacuum and Extreme Ultraviolet Radiation for Postionization of Laser Desorbed Neutrals from Bacterial Biofilms and Organic Fullerene

    Energy Technology Data Exchange (ETDEWEB)

    Gaspera, Gerald L.; Takahashi, Lynelle K.; Zhou, Jia; Ahmed, Musahid; Moored, Jerry F.; Hanley, Luke

    2010-12-08

    Vacuum and extreme ultraviolet radiation from 8 - 24 eV generated at a synchrotron was used to postionize laser desorbed neutrals of antibiotic-treated biofilms and a modified fullerene using laser desorption postionization mass spectrometry (LDPI-MS). Results show detection of the parent ion, various fragments, and extracellular material from biofilms using LDPI-MS with both vacuum and extreme ultraviolet photons. Parent ions were observed for both cases, but extreme ultraviolet photons (16-24 eV) induced more fragmentation than vacuum ultraviolet (8-14 eV) photons.

  7. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    Science.gov (United States)

    Hock, R. A.; Chamberlin, P. C.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Woods, E. C.

    2012-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. ( Solar Phys., 2010, doi:10.1007/s11207-009-9485-8). In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  8. A high repetition rate XUV seeding source for FLASH2

    Energy Technology Data Exchange (ETDEWEB)

    Willner, Arik

    2012-05-15

    Improved performance of free-electron laser (FEL) light sources in terms of timing stability, pulse shape and spectral properties of the amplified FEL pulses is of interest in material science, the fields of ultrafast dynamics, biology, chemistry and even special branches in industry. A promising scheme for such an improvement is direct seeding with high harmonic generation (HHG) in a noble gas target. A free-electron laser seeded by an external extreme ultraviolet (XUV) source is planned for FLASH2 at DESY in Hamburg. The requirements for the XUV/soft X-ray source can be summarized as follows: A repetition rate of at least 100 kHz in a 10 Hz burst is needed at variable wavelengths from 10 to 40 nm and pulse energies of several nJ within a single laser harmonic. This application requires a laser amplifier system with exceptional parameters, mJ-level pulse energy, 10-15 fs pulse duration at 100 kHz (1 MHz) burst repetition rate. A new optical parametric chirped-pulse amplification (OPCPA) system is under development in order to meet these requirements, and very promising results have been achieved in the last three years. In parallel to this development, a new HHG concept is necessary to sustain high average power of the driving laser system and to generate harmonics with high conversion efficiencies. Currently, the highest conversion efficiency with HHG has been demonstrated using gas-filled capillary targets. For our application, only a free-jet target can be used for HHG, in order to overcome damage threshold limitations of HHG target optics at a high repetition rate. A novel dual-gas multijet gas target has been developed and first experiments show remarkable control of the degree of phase matching forming the basis for improved control of the harmonic photon flux and the XUV pulse characteristics. The basic idea behind the dual-gas concept is the insertion of matching zones in between multiple HHG sources. These matching sections are filled with hydrogen which

  9. EUV SpectroPhotometer (ESP) in Extreme Ultraviolet Variability Experiment (EVE): Algorithms and Calibrations

    Science.gov (United States)

    Didkovsky, L.; Judge, D.; Wieman, S.; Woods, T.; Jones, A.

    2012-01-01

    The Extreme ultraviolet SpectroPhotometer (ESP) is one of five channels of the Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO). The ESP channel design is based on a highly stable diffraction transmission grating and is an advanced version of the Solar Extreme ultraviolet Monitor (SEM), which has been successfully observing solar irradiance onboard the Solar and Heliospheric Observatory (SOHO) since December 1995. ESP is designed to measure solar Extreme UltraViolet (EUV) irradiance in four first-order bands of the diffraction grating centered around 19 nm, 25 nm, 30 nm, and 36 nm, and in a soft X-ray band from 0.1 to 7.0 nm in the zeroth-order of the grating. Each band’s detector system converts the photo-current into a count rate (frequency). The count rates are integrated over 0.25-second increments and transmitted to the EVE Science and Operations Center for data processing. An algorithm for converting the measured count rates into solar irradiance and the ESP calibration parameters are described. The ESP pre-flight calibration was performed at the Synchrotron Ultraviolet Radiation Facility of the National Institute of Standards and Technology. Calibration parameters were used to calculate absolute solar irradiance from the sounding-rocket flight measurements on 14 April 2008. These irradiances for the ESP bands closely match the irradiance determined for two other EUV channels flown simultaneously: EVE’s Multiple EUV Grating Spectrograph (MEGS) and SOHO’s Charge, Element and Isotope Analysis System/ Solar EUV Monitor (CELIAS/SEM).

  10. Clusters in Intense XUV pulses: effects of cluster size on expansion dynamics and ionization

    CERN Document Server

    Ackad, Edward; Briggs, Kyle; Ramunno, Lora

    2010-01-01

    We examine the effect of cluster size on the interaction of Ar$_{55}$-Ar$_{2057}$ with intense extreme ultraviolet (XUV) pulses, using a model we developed earlier that includes ionization via collisional excitation as an intermediate step. We find that the dynamics of these irradiated clusters is dominated by collisions. Larger clusters are more highly collisional, produce higher charge states, and do so more rapidly than smaller clusters. Higher charge states produced via collisions are found to reduce the overall photon absorption, since charge states of Ar$^{2+}$ and higher are no longer photo-accessible. We call this mechanism \\textit{collisionally reduced photoabsorption}, and it decreases the effective cluster photoabsorption cross-section by more than 30% for Ar$_{55}$ and 45% Ar$_{2057}$. compared to gas targets with the same number of atoms. An investigation of the shell structure soon after the laser interaction shows an almost uniformly charged core with a modestly charged outer shell which evolve...

  11. Fast temporal correlation between hard X-ray and ultraviolet continuum brightenings

    Science.gov (United States)

    Machado, Marcos E.; Mauas, Pablo J.

    1986-01-01

    Recent Solar Maximum Mission (SMM) observations have shown fast and simultaneous increases in hard X-rays (HXR, E25 keV) and ultraviolet continuum (UVC, lambda lambda approx. equals 1600 and 1388 A) radiation. A simple and natural explanation is given for this phenomenon to happen, which does not involve extreme conditions for energy transport processes, and confirms earlier results on the effect of XUV photoionization in the solar atmosphere.

  12. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    Science.gov (United States)

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  13. Supersonic cluster jet source for debris-free extreme ultraviolet production

    Energy Technology Data Exchange (ETDEWEB)

    Kubiak, G.D.; Bernardez, L.J.

    1997-09-01

    The supersonic cluster jet has been developed and characterized for use as a target medium to produce a clean source of extreme ultraviolet radiation for extreme ultraviolet lithography and other applications. Spectroscopic characterization of the laser plasma emission produced from Xe, O{sub 2} and Kr cluster gas targets has been performed. Xe is the most efficient target gas, exhibiting a conversion efficiency at 13.5 nm of 0.8% into the relevant 2.5% spectral bandwidth. The other target gases are less efficient in the spectral region of interest and, in the case of oxygen, emit {approximately}5 times less off-band radiation. The angular distribution of the Xe plasma emission has also been characterized.

  14. Carbon coatings for extreme-ultraviolet high-order laser harmonics

    Energy Technology Data Exchange (ETDEWEB)

    Coraggia, S.; Frassetto, F. [CNR-Institute of Photonics and Nanotechnologies, Laboratory for UV and X-Ray Optical Research, via Trasea 7, 35131 Padova (Italy); Aznarez, J.A.; Larruquert, J.I.; Mendez, J.A. [GOLD-Instituto de Optica-Consejo Superior de Investigaciones Cientificas, Serrano 144, 28006 Madrid (Spain); Negro, M.; Stagira, S.; Vozzi, C. [Department of Physics-Politecnico of Milano and CNR-Institute of Photonics and Nanotechnologies, Piazza Leonardo Da Vinci 32, 20133 Milano (Italy); Poletto, L., E-mail: poletto@dei.unipd.i [CNR-Institute of Photonics and Nanotechnologies, Laboratory for UV and X-Ray Optical Research, via Trasea 7, 35131 Padova (Italy)

    2011-04-11

    The experimental study of the optical properties of thin carbon films to be used as grazing-incidence coatings for extreme-ultraviolet high-order harmonics is presented. The carbon samples were deposited on plane glass substrates by the electron beam evaporation technique. The optical constants (real and imaginary parts of the refraction index) have been calculated through reflectivity measurements. The results are in good agreement with what reported in the literature, and confirm that carbon-coated optics operated at grazing incidence have a remarkable gain over conventional metallic coatings in the extreme ultraviolet. Since the harmonics co-propagate with the intense infrared laser generating beam, the carbon damage threshold when exposed to ultrashort infrared laser pulses has been measured.

  15. Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

    Energy Technology Data Exchange (ETDEWEB)

    Oyama, Tomoko Gowa, E-mail: ohyama.tomoko@qst.go.jp [Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology, 1233 Watanuki-machi, Takasaki, Gunma 370-1292 (Japan); Oshima, Akihiro; Tagawa, Seiichi, E-mail: tagawa@sanken.osaka-u.ac.jp [Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan); The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047 (Japan)

    2016-08-15

    It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, we calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).

  16. The Extreme Ultraviolet Spectrum of the Kinetically Dominated Quasar 3C 270.1

    CERN Document Server

    Punsly, Brian

    2015-01-01

    Only a handful of quasars have been identified as kinetically dominated, their long term time averaged jet power, $\\overline{Q}$, exceeds the bolometric thermal emission, $L_{bol}$, associated with the accretion flow. This letter presents the first extreme ultraviolet (EUV) spectrum of a kinetically dominated quasar, 3C 270.1. The EUV continuum flux density of 3C 270.1 is very steep, $F_{\

  17. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    Energy Technology Data Exchange (ETDEWEB)

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria [National Research Council of Italy, Institute for Photonics and Nanotechnology, via Trasea 7, 35131 Padova (Italy); Department of Information Engineering, University of Padova, via Gradenigo 6/B, 35131 Padova (Italy); Zuppella, Paola [National Research Council of Italy, Institute for Photonics and Nanotechnology, via Trasea 7, 35131 Padova (Italy); Barkusky, Frank [Laser-Laboratorium Goettingen e.V, Goettingen (Germany); KLA-Tencor, 5 Technology Dr., Milpitas, California 95035 (United States); Mann, Klaus; Mueller, Matthias [Laser-Laboratorium Goettingen e.V, Goettingen (Germany)

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  18. The intrinsic extreme ultraviolet fluxes of F5 V to M5 V stars

    Energy Technology Data Exchange (ETDEWEB)

    Linsky, Jeffrey L. [JILA, University of Colorado and NIST, 440UCB Boulder, CO 80309-0440 (United States); Fontenla, Juan [NorthWest Research Associates Inc., 3380 Mitchell Ln, Boulder, CO 80301 (United States); France, Kevin, E-mail: jlinsky@jilau1.colorado.edu, E-mail: jfontenla@nwra.com, E-mail: Kevin.France@colorado.edu [CASA, University of Colorado, 593UCB Boulder, CO 80309-0593 (United States)

    2014-01-01

    Extreme ultraviolet (EUV) radiations (10-117 nm) from host stars play important roles in the ionization, heating, and mass loss from exoplanet atmospheres. Together with the host star's Lyα and far-UV (117-170 nm) radiation, EUV radiation photodissociates important molecules, thereby changing the chemistry in exoplanet atmospheres. Since stellar EUV fluxes cannot now be measured and interstellar neutral hydrogen completely obscures stellar radiation between 40 and 91.2 nm, even for the nearest stars, we must estimate the unobservable EUV flux by indirect methods. New non-LTE semiempirical models of the solar chromosphere and corona and solar irradiance measurements show that the ratio of EUV flux in a variety of wavelength bands to the Lyα flux varies slowly with the Lyα flux and thus with the magnetic heating rate. This suggests and we confirm that solar EUV/Lyα flux ratios based on the models and observations are similar to the available 10-40 nm flux ratios observed with the Extreme Ultraviolet Explorer (EUVE) satellite and the 91.2-117 nm flux observed with the Far Ultraviolet Spectroscopic Explorer (FUSE) satellite for F5 V-M5 V stars. We provide formulae for predicting EUV flux ratios based on the EUVE and FUSE stellar data and on the solar models, which are essential input for modeling the atmospheres of exoplanets.

  19. Limitations of Extreme Nonlinear Ultrafast Nanophotonics

    Directory of Open Access Journals (Sweden)

    Kern Christian

    2015-01-01

    Full Text Available High-harmonic generation (HHG has been established as an indispensable tool in optical spectroscopy. This effect arises for instance upon illumination of a noble gas with sub-picosecond laser pulses at focussed intensities significantly greater than 1012W/cm2. HHG provides a coherent light source in the extreme ultraviolet (XUV spectral region, which is of importance in inner shell photo ionization of many atoms and molecules. Additionally, it intrinsically features light fields with unique temporal properties. Even in its simplest realization, XUV bursts of sub-femtosecond pulse lengths are released. More sophisticated schemes open the path to attosecond physics by offering single pulses of less than 100 attoseconds duration.

  20. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection.

    Science.gov (United States)

    Chai, Kil-Byoung; Bellan, Paul M

    2013-12-01

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10(6) frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  1. Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Higashiguchi, Takeshi, E-mail: higashi@cc.utsunomiya-u.ac.jp; Yamaguchi, Mami; Otsuka, Takamitsu; Nagata, Takeshi [Department of Advanced Interdisciplinary Sciences and Center for Optical Research (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 Japan (Japan); Ohashi, Hayato [Graduate School of Science and Engineering for Research, University of Toyama, Toyama, Toyama 930-8555 (Japan); Li, Bowen [School of Nuclear Science and Technology, Lanzhou University, Lanzhou, 730000 (China); School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland); D’Arcy, Rebekah; Dunne, Padraig; O’Sullivan, Gerry [School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)

    2014-09-15

    Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

  2. Final Report: Spectral Analysis of L-shell Data in the Extreme Ultraviolet from Tokamak Plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Lepson, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Jernigan, J. Garrett [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Beiersdorfer, P. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2016-02-05

    We performed detailed analyses of extreme ultraviolet spectra taken by Lawrence Livermore National Laboratory on the National Spherical Torus Experiment at Princeton Plasma Physics Laboratory and on the Alcator CKmod tokamak at the M.I.T. Plasma Science and Fusion Center. We focused on the emission of iron, carbon, and other elements in several spectral band pass regions covered by the Atmospheric Imaging Assembly on the Solar Dynamics Observatory. We documented emission lines of carbon not found in currently used solar databases and demonstrated that this emission was due to charge exchange.

  3. Dissociative multiple ionization of diatomic molecules by extreme-ultraviolet free-electron-laser pulses

    DEFF Research Database (Denmark)

    Madsen, Lars Bojer; Leth, Henriette Astrup

    2011-01-01

    Nuclear dynamics in dissociative multiple ionization processes of diatomic molecules exposed to extreme-ultraviolet free-electron-laser pulses is studied theoretically using the Monte Carlo wave packet approach. By simulated detection of the emitted electrons, the model reduces a full propagation...... of the system to propagations of the nuclear wave packet in one specific electronic charge state at a time. Suggested ionization channels can be examined, and kinetic energy release spectra for the nuclei can be calculated and compared with experiments. Double ionization of O2 is studied as an example, and good...

  4. Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography

    Science.gov (United States)

    Abramov, I. S.; Gospodchikov, E. D.; Shalashov, A. G.

    2017-07-01

    In this paper, inspired by the success of recent experiments, we discuss a new possible type of sources of extreme ultraviolet radiation for the semiconductor industry, based on the radiating plasma with multiply charged ions supported in a mirror magnetic trap by high-power microwaves. We propose a simple theory that describes the main features of such source, perform modeling for a wide range of plasma parameters and magnetic configurations, compare the results to the existing experimental data, and study the prospects of the new scheme in present technological circumstances.

  5. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  6. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    Energy Technology Data Exchange (ETDEWEB)

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  7. EIT: Solar corona synoptic observations from SOHO with an Extreme-ultraviolet Imaging Telescope

    Science.gov (United States)

    Delaboudiniere, J. P.; Gabriel, A. H.; Artzner, G. E.; Michels, D. J.; Dere, K. P.; Howard, R. A.; Catura, R.; Stern, R.; Lemen, J.; Neupert, W.

    1988-01-01

    The Extreme-ultraviolet Imaging Telescope (EIT) of SOHO (solar and heliospheric observatory) will provide full disk images in emission lines formed at temperatures that map solar structures ranging from the chromospheric network to the hot magnetically confined plasma in the corona. Images in four narrow bandpasses will be obtained using normal incidence multilayered optics deposited on quadrants of a Ritchey-Chretien telescope. The EIT is capable of providing a uniform one arc second resolution over its entire 50 by 50 arc min field of view. Data from the EIT will be extremely valuable for identifying and interpreting the spatial and temperature fine structures of the solar atmosphere. Temporal analysis will provide information on the stability of these structures and identify dynamical processes. EIT images, issued daily, will provide the global corona context for aid in unifying the investigations and in forming the observing plans for SOHO coronal instruments.

  8. First observation of SASE radiation using the compact wide-spectral-range XUV spectrometer at FLASH2

    Energy Technology Data Exchange (ETDEWEB)

    Tanikawa, T., E-mail: takanori.tanikawa@desy.de [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); Hage, A. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); School of Mathematics and Physics, Queen' s University Belfast, University Road, Belfast BT7 1NN (United Kingdom); Kuhlmann, M. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); Gonschior, J. [Max Planck Research Group for Structural Dynamics, Notkestrasse 85, 22607 Hamburg (Germany); Grunewald, S.; Plönjes, E.; Düsterer, S.; Brenner, G.; Dziarzhytski, S.; Braune, M.; Brachmanski, M. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); Yin, Z. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany); Max Planck Institute for Biophysical Chemistry, Am Fassberg 11, 37077 Göttingen (Germany); Siewert, F. [Helmholtz Zentrum Berlin, Albert-Einstein-Str. 15, 12489 Berlin (Germany); Dzelzainis, T.; Dromey, B. [School of Mathematics and Physics, Queen' s University Belfast, University Road, Belfast BT7 1NN (United Kingdom); Prandolini, M.J. [Helmholtz-Institut Jena, Fröbelstieg 3, 07743 Jena (Germany); Tavella, F. [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, CA 94025 (United States); Zepf, M. [School of Mathematics and Physics, Queen' s University Belfast, University Road, Belfast BT7 1NN (United Kingdom); Helmholtz-Institut Jena, Fröbelstieg 3, 07743 Jena (Germany); Faatz, B. [Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg (Germany)

    2016-09-11

    The Free-electron LASer in Hamburg (FLASH) has been extended with a new undulator line FLASH2 in 2014. A compact grazing-incident wide-spectral-range spectrometer based on spherical-variable-line-spacing (SVLS) gratings in the extreme ultraviolet (XUV) region was constructed to optimize and characterize the free-electron laser (FEL) performance at FLASH2. The spectrometer is equipped with three different concave SVLS gratings covering a spectral range from 1 to 62 nm to analyze the spectral characteristics of the XUV radiation. Wavelength calibration and evaluation of the spectral resolution were performed at the plane grating monochromator beamline PG2 at FLASH1 before the installation at FLASH2, and compared with analytical simulations. The first light using self-amplified spontaneous emission from FLASH2 was observed by the spectrometer during a simultaneous operation of both undulator lines—FLASH1 and FLASH2. In addition, the spectral resolution of the spectrometer was evaluated by comparing the measured spectrum from FLASH2 with FEL simulations.

  9. Spectral photometry of extreme helium stars: Ultraviolet fluxes and effective temperature

    Science.gov (United States)

    Drilling, J. S.; Schoenberner, D.; Heber, U.; Lynas-Gray, A. E.

    1982-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broad band photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broad band photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K.

  10. Lifetime Calculations on Collector Optics from Laser Plasma Extreme Ultraviolet Sources with Minimum Mass

    Institute of Scientific and Technical Information of China (English)

    WU Tao; WANG Xin-Bing

    2011-01-01

    An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum. According to the ion flux and energy distribution, the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation. The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.%@@ An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum.According to the ion flux and energy distribution,the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation.The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.

  11. Development of compact extreme ultraviolet interferometry for on-line test of lithography cameras

    Energy Technology Data Exchange (ETDEWEB)

    Ray-Chaudhuri, A.K.; Nissen, R.P.; Krenz, K.D.; Stulen, R.H. [Sandia National Labs., Livermore, CA (United States); Sweatt, W.C.; Warren, M.E.; Wendt, J.R.; Kravitz, S.H. [Sandia National Labs., Albuquerque, NM (United States); Bjorkholm, J.E. [AT and T Bell Labs., Holmdel, NJ (United States)

    1998-12-31

    Extreme ultraviolet lithography (EUVL) is a candidate technology for the microelectronics industry with design rules for 0.1 {micro}m features and beyond. When characterizing an extreme ultraviolet (EUV) lithographic optical system, visible light interferometry is limited to measuring wavefront aberration caused by surface figure error while failing to measure wavefront errors induced by the multilayer coatings. This fact has generated interest in developing interferometry at an EUV camera`s operational wavelength (at-wavelength testing), which is typically around 13 nm. While a laser plasma source (LPS) is being developed as a lithography production source, it has generally been considered that only an undulator located at a synchrotron facility can provide the necessary laser-like point source for EUV interferometry. Although an undulator-based approach has been successfully demonstrated, it would be advantageous to test a camera in its operational configuration. The authors are developing the latter approach by utilizing extended source size schemes to provide usable flux throughput. A slit or a grating mounted in front of the source can provide the necessary spatial coherence for Ronchi interferometry. The usable source size is limited only by the well-corrected field of view of the camera under test. The development of this interferometer will be presented.

  12. Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

    Directory of Open Access Journals (Sweden)

    Tomoko Gowa Oyama

    2016-08-01

    Full Text Available It is a challenge to obtain sufficient extreme ultraviolet (EUV exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB sources. If the chemical reactions induced by two ionizing sources (EB and EUV are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity for the EB and EUV would be almost equivalent. Based on this theory, we calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL.

  13. Emission Lines of Fe XI - XIII in the Extreme Ultraviolet Region

    Science.gov (United States)

    Lepson, Jaan; Beiersdorfer, Peter; Liedahl, Duane; Desai, Priya; Brickhouse, Nancy; Dupree, Andrea; Kahn, Steven

    2009-05-01

    Iron is one of the most abundant heavy elements in extreme ultraviolet spectra of astrophysical and laboratory plasmas, and its various ions radiate profusely in the extreme ultraviolet (EUV) wavelength band. Iron emission in the EUV provides important d iagnostic tools for such properties as plasma temperature and density, and perhaps even magnetic field strength. Despite its importance to astrophysics and magnetic fusion, knowledge of the EUV spectrum of iron is incomplete. Identification of iron emis sion lines is hampered by the paucity of accurate laboratory measurements and the uncertainty of even the best atomic models. As part of a project to measure and compile emission line data in the EUV, we present here spectra and lines of Fe XI - XIII recorded on the Livermore EBIT-II electron beam ion trap in the 50 - 120 åregion. We measured line positions to 0.02 åand relative intensities with an accuracy of one part in twenty. Many new lines are identified and added to the available databa ses. Part of this work was performed under the auspices of the U S Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344 and was supported by NASA's Astronomy and Physics Research and Analysis Program under Con t ract NNH07AF811.

  14. Probing autoionizing states of molecular oxygen with XUV transient absorption: Electronic symmetry dependent lineshapes and laser induced modification

    CERN Document Server

    Liao, Chen-Ting; Haxton, Daniel J; Rescigno, Thomas N; Lucchese, Robert R; McCurdy, C William; Sandhu, Arvinder

    2016-01-01

    The dynamics of autoionizing Rydberg states of oxygen are studied using attosecond transient absorption technique, where extreme ultraviolet (XUV) initiates molecular polarization and near infrared (NIR) pulse perturbs its evolution. Transient absorption spectra show positive optical density (OD) change in the case of $ns\\sigma_g$ and $nd\\pi_g$ autoionizing states of oxygen and negative OD change for $nd\\sigma_g$ states. Multiconfiguration time-dependent Hartree-Fock (MCTDHF) calculation are used to simulate the transient absorption spectra and their results agree with experimental observations. The time evolution of superexcited states is probed in electronically and vibrationally resolved fashion and we observe the dependence of decay lifetimes on effective quantum number of the Rydberg series. We model the effect of near-infrared (NIR) perturbation on molecular polarization and find that the laser induced phase shift model agrees with the experimental and MCTDHF results, while the laser induced attenuation...

  15. Extremely Nonlinear Optics Using Shaped Pulses Spectrally Broadened in an Argon- or Sulfur Hexafluoride-Filled Hollow-Core Fiber

    OpenAIRE

    Andreas Hoffmann; Michael Zürch; Christian Spielmann

    2015-01-01

    In this contribution we present a comparison of the performance of spectrally broadened ultrashort pulses using a hollow-core fiber either filled with argon or sulfur hexafluoride (SF6) for demanding pulse-shaping experiments. The benefits of both gases for pulse-shaping are studied in the highly nonlinear process of high-harmonic generation. In this setup, temporally shaping the driving laser pulse leads to spectrally shaping of the output extreme ultraviolet (XUV) spectrum, where total yie...

  16. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    Energy Technology Data Exchange (ETDEWEB)

    Wang, He [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division; Xu, Yiming [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division; Ulonska, Stefan [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division; Robinson, Joseph S. [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division; Ranitovic, Predrag [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division; Kaindl, Robert A. [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Materials Sciences Division

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  17. Surface modification of polymers for biocompatibility via exposure to extreme ultraviolet radiation.

    Science.gov (United States)

    Inam Ul Ahad; Bartnik, Andrzej; Fiedorowicz, Henryk; Kostecki, Jerzy; Korczyc, Barbara; Ciach, Tomasz; Brabazon, Dermot

    2014-09-01

    Polymeric biomaterials are being widely used for the treatment of various traumata, diseases and defects in human beings due to ease in their synthesis. As biomaterials have direct interaction with the extracellular environment in the biological world, biocompatibility is a topic of great significance. The introduction or enhancement of biocompatibility in certain polymers is still a challenge to overcome. Polymer biocompatibility can be controlled by surface modification. Various physical and chemical methods (e.g., chemical and plasma treatment, ion implantation, and ultraviolet irradiation etc.) are in use or being developed for the modification of polymer surfaces. However an important limitation in their employment is the alteration of bulk material. Different surface and bulk properties of biomaterials are often desirable for biomedical applications. Because extreme ultraviolet (EUV) radiation penetration is quite limited even in low density mediums, it could be possible to use it for surface modification without influencing the bulk material. This article reviews the degree of biocompatibility of different polymeric biomaterials being currently employed in various biomedical applications, the surface properties required to be modified for biocompatibility control, plasma and laser ablation based surface modification techniques, and research studies indicating possible use of EUV for enhancing biocompatibility.

  18. Thin film and multilayer coating development for the extreme ultraviolet spectral region

    Energy Technology Data Exchange (ETDEWEB)

    Garoli, D. [INFM-LUXOR DEI University of Padova, via Gradenigo 6/B, 35131 Padova (Italy)]. E-mail: garoli@dei.unipd.it; Monaco, G. [INFM-LUXOR DEI University of Padova, via Gradenigo 6/B, 35131 Padova (Italy); Frassetto, F. [INFM-LUXOR DEI University of Padova, via Gradenigo 6/B, 35131 Padova (Italy); Pelizzo, M.G. [INFM-LUXOR DEI University of Padova, via Gradenigo 6/B, 35131 Padova (Italy); Nicolosi, P. [INFM-LUXOR DEI University of Padova, via Gradenigo 6/B, 35131 Padova (Italy); Armelao, L. [Dipartimento di Scienze Chimiche, University of Padova, Via Marzolo 1, 35131 Padova (Italy); Mattarello, V. [INFN-LNL, strada Romea 35020 Legnaro PD (Italy); Rigato, V. [INFN-LNL, strada Romea 35020 Legnaro PD (Italy)

    2006-11-15

    B{sub 4}C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region. This material is also used combined with others materials in multilayer such as Si/B{sub 4}C or as interlayer in Mo/Si multilayer to avoid interdiffusion. In this study we have performed optical, compositional and structural analyses for thin film of B{sub 4}C deposited by means of magnetron sputtering and on preliminary samples deposited by e-beam evaporation. Here we report reflectivity measurements and the derived optical constants of B{sub 4}C in the 400-1500 A region.

  19. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption.

    Science.gov (United States)

    Sun, J Q; Cheng, X; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-06-26

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin.

  20. SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging.

    Science.gov (United States)

    Kjornrattanawanich, Benjawan; Windt, David L; Seely, John F; Uspenskii, Yurii A

    2006-03-10

    Narrowband SiC/Tb and Si/Tb multilayers are fabricated with as much as a 23% normal-incidence reflectance near a 60 nm wavelength and spectral bandpass (FWHM) values of 9.4 and 6.5 nm, respectively. The structural properties of the films are investigated using extreme ultraviolet and x-ray reflectometry and transmission electron microscopy. Thermal stability is investigated in films annealed to as high as 300 degrees C. Because of their superior thermal stability, relatively high reflectance, and narrower spectral bandpass, Si/Tb multilayers are identified as optimal candidates for solar physics imaging applications, where the peak response can be tuned to important emission lines such as O v near 63.0 nm and Mg x near 61.0 nm. We describe our experimental procedures and results, discuss the implications of our findings, and outline prospects for improved performance.

  1. Measurements and identifications of extreme ultraviolet spectra of highly-charged Sm and Er

    CERN Document Server

    Podpaly, Y A; Reader, J; Ralchenko, Yu

    2014-01-01

    We report spectroscopic measurements of highly charged samarium and erbium performed at the National Institute of Standards and Technology (NIST) Electron Beam Ion Trap (EBIT). These measurements are in the extreme ultraviolet (EUV) range, and span electron beam energies from 0.98 keV to 3.00 keV. We observed 71 lines from Kr-like Sm$^{26+}$ to Ni-like Sm$^{34+}$, connecting 83 energy levels, and 64 lines from Rb-like Er$^{32+}$ to Ni-like Er$^{40+}$, connecting 78 energy levels. Of these lines, 64 in Sm and 60 in Er are new. Line identifications are performed using collisional-radiative modeling of the EBIT plasma. All spectral lines are assigned individual uncertainties, most in the $\\sim$0.001 nm range. Energy levels are derived from the wavelength measurements.

  2. High-Resolution Spectroscopy of G191-B2B in the Extreme Ultraviolet

    CERN Document Server

    Cruddace, R G; Yentis, D J; Brown, C M; Gursky, H; Barstow, M A; Bannister, N P; Fraser, G W; Spragg, J E; Lapington, J S; Tandy, J A; Sanderson, B; Culhane, J L; Barbee, T W; Kordas, J F; Goldstein, W H; Fritz, G G

    2001-01-01

    We report a high-resolution (R=3000-4000) spectroscopic observation of the DA white dwarf G191-B2B in the extreme ultraviolet band 220-245 A. A low- density ionised He component is clearly present along the line-of-sight, which if completely interstellar implies a He ionisation fraction considerably higher than is typical of the local interstellar medium. However, some of this material may be associated with circumstellar gas, which has been detected by analysis of the C IV absorption line doublet in an HST STIS spectrum. A stellar atmosphere model assuming a uniform element distribution yields a best fit to the data which includes a significant abundance of photospheric He. The 99-percent confidence contour for the fit parameters excludes solutions in which photospheric He is absent, but this result needs to be tested using models allowing abundance gradients.

  3. Fluorescence Efficiency and Visible Re-emission Spectrum of Tetraphenyl Butadiene Films at Extreme Ultraviolet Wavelengths

    CERN Document Server

    Gehman, V M; Rielage, K; Hime, A; Sun, Y; Mei, D -M; Maassen, J; Moore, D

    2011-01-01

    A large number of current and future experiments in neutrino and dark matter detection use the scintillation light from noble elements as a mechanism for measuring energy deposition. The scintillation light from these elements is produced in the extreme ultraviolet (EUV) range, from 60 - 200 nm. Currently, the most practical technique for observing light at these wavelengths is to surround the scintillation volume with a thin film of Tetraphenyl Butadiene (TPB) to act as a fluor. The TPB film absorbs EUV photons and reemits visible photons, detectable with a variety of commercial photosensors. Here we present a measurement of the re-emission spectrum of TPB films when illuminated with 128, 160, 175, and 250 nm light. We also measure the fluorescence efficiency as a function of incident wavelength from 120 to 250 nm.

  4. Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources

    Energy Technology Data Exchange (ETDEWEB)

    Wu Tao [Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Rao Zhiming [Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine, Nanchang 330004, Jiangxi (China); Wang Shifang, E-mail: flatime@163.com [School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East High-Tech. Zone, Wuhan 430205, Hubei (China)

    2011-02-01

    Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.

  5. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Ahad, Inam Ul, E-mail: inam-ul.ahad@wat.edu.pl [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland); Butruk, Beata [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Ciach, Tomasz [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Brabazon, Dermot [Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland)

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser–plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  6. Extreme ultraviolet spectroscopy and atomic models of highly charged heavy ions in the Large Helical Device

    Science.gov (United States)

    Suzuki, C.; Murakami, I.; Koike, F.; Tamura, N.; Sakaue, H. A.; Morita, S.; Goto, M.; Kato, D.; Ohashi, H.; Higashiguchi, T.; Sudo, S.; O'Sullivan, G.

    2017-01-01

    We report recent results of extreme ultraviolet (EUV) spectroscopy of highly charged heavy ions in plasmas produced in the Large Helical Device (LHD). The LHD is an ideal source of experimental databases of EUV spectra because of high brightness and low opacity, combined with the availability of pellet injection systems and reliable diagnostic tools. The measured heavy elements include tungsten, tin, lanthanides and bismuth, which are motivated by ITER as well as a variety of plasma applications such as EUV lithography and biological microscopy. The observed spectral features drastically change between quasicontinuum and discrete depending on the plasma temperature, which leads to some new experimental identifications of spectral lines. We have developed collisional-radiative models for some of these ions based on the measurements. The atomic number dependence of the spectral feature is also discussed.

  7. Design and performance of the telescope and detector covers on the Extreme Ultraviolet Explorer satellite

    Science.gov (United States)

    Tom, James L.

    1994-01-01

    Two cover mechanisms were designed and developed for the Extreme Ultraviolet Explorer (EUVE) science payload to keep the EUVE telescope mirrors and detectors sealed from the atmospheric environment until the spacecraft was placed into orbit. There were four telescope front covers and seven motorized detector covers on the EUVE science payload. The EUVE satellite was launched into orbit in June 1992 and all the covers operated successfully after launch. This success can be attributed to high design margins and extensive testing at each level of assembly. This paper described the design of the telescope front covers and the motorized detector covers. This paper also discusses some of the many design considerations and modifications made as performance and reliability problems became apparent from each phase of testing.

  8. Methods and apparatus for use with extreme ultraviolet light having contamination protection

    Energy Technology Data Exchange (ETDEWEB)

    Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy; Klebanoff, Leonard E.; Delgado, Gildardo R.; Rader, Daniel J.; Geller, Anthony S.; Gallis, Michail A.

    2016-07-12

    An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

  9. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

    Science.gov (United States)

    Kunkemöller, Georg; Mass, Tobias W W; Michel, Ann-Katrin U; Kim, Hyun-Su; Brose, Sascha; Danylyuk, Serhiy; Taubner, Thomas; Juschkin, Larissa

    2015-10-05

    We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.

  10. A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

    Science.gov (United States)

    Wachulak, P. W.; Torrisi, A.; Bartnik, A.; Węgrzyński, Ł.; Fok, T.; Fiedorowicz, H.

    2017-01-01

    A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25-75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.

  11. Analysis of observational data from Extreme Ultra-Violet Camera onboard Chang'E-3 mission

    Science.gov (United States)

    Yan, Yan; Wang, Hua-Ning; He, Han; He, Fei; Chen, Bo; Feng, Jian-Qing; Ping, Jin-Song; Shen, Chao; Xu, Rong-Lan; Zhang, Xiao-Xin

    2016-02-01

    The Extreme Ultra-Violet Camera (hereafter EUVC) is a scientific payload onboard the lander of the Chang'E-3 (hereafter CE-3) mission launched on December 1st, 2013. Centering on a spectral band around 30.4 nm, EUVC provides the global images of the Earth's plasmasphere from the meridian view, with a spatial resolution of 0.1 R_{oplus} in 150 × 150 pixels and a cadence of 10 minutes. Along with the data being publicly released online, some unsettled issues in the early stage have been clarified, including the geometrical preparations, the refined approach on the coefficient K for the background, and the alignment among the images. A demo of data after all the above processes is therefore presented as a guidance for users who are studying the structure and dynamics of the plasmasphere.

  12. Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

    Science.gov (United States)

    Sporre, John R.; Elg, Daniel T.; Kalathiparambil, Kishor K.; Ruzic, David N.

    2016-01-01

    A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation.

  13. Extreme Ultraviolet Imaging of Three-dimensional Magnetic Reconnection in a Solar Eruption

    CERN Document Server

    Sun, J Q; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively. It is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions (3D) using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet (EUV) images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from $\\sim$1 to $\\ge$5 MK. Shortly afterwards, warm flare loops ($\\sim$3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magneti...

  14. NRL-ATM extreme ultraviolet solar image TV monitor flown on Skylab

    Science.gov (United States)

    Crockett, W. R.; Purcell, J. D.; Schumacher, R. J.; Tousey, R.; Patterson, N. P.

    1977-01-01

    An instrument for recording extreme ultraviolet television images of the sun was flown in the Apollo Telescope Mount on Skylab. Solar radiation in the 171-630 A wavelength range, defined by the transmission band of three thin-film aluminum filters, was focused onto a p-quaterphenyl photon conversion layer by a platinum-coated mirror at normal incidence. The conversion layer was attached to the faceplate of a low light level SEC vidicon. An onboard video monitor enabled the Skylab crews to observe the images in real-time and to identify and follow the development of solar features. Images were also transmitted to the mission control center, where they were used in planning the ATM observing schedule.

  15. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    Directory of Open Access Journals (Sweden)

    Zheng Li

    2016-07-01

    Full Text Available The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2On after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. For situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects.

  16. Tabletop Nanometer Extreme Ultraviolet Imaging in an Extended Reflection Mode using Coherent Fresnel Ptychography

    CERN Document Server

    Seaberg, Matthew D; Gardner, Dennis F; Shanblatt, Elisabeth R; Murnane, Margaret M; Kapteyn, Henry C; Adams, Daniel E

    2013-01-01

    We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractive imaging in the most general reflection geometry by combining ptychography with tilted plane correction. This method makes it possible to image extended surfaces at any angle of incidence. Refocused light from a tabletop coherent high harmonic light source at 29 nm illuminates a nanopatterned surface at 45 degree angle of incidence. The reconstructed image contains quantitative amplitude and phase (in this case pattern height) information, comparing favorably with both scanning electron microscope and atomic force microscopy images. In the future, this approach will enable imaging of complex surfaces and nanostructures with sub-10 nm-spatial resolution and fs-temporal resolution, which will impact a broad range of nanoscience and nanotechnology including for direct application in actinic inspection in support of EUV lithography.

  17. Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration

    Science.gov (United States)

    Liu, Yan; Li, Yanqiu

    2016-09-01

    At present, few projection objectives for extreme ultraviolet (EUV) lithography pay attention to correct thermal aberration in optical design phase, which would lead to poor image quality in a practical working environment. We present an aspherical modification method for helping the EUV lithographic objective additionally correct the thermal aberration. Based on the thermal aberration and deformation predicted by integrated optomechanical analysis, the aspherical surfaces in an objective are modified by an iterative algorithm. The modified aspherical surfaces could correct the thermal aberration and maintain the initial high image quality in a practical working environment. A six-mirror EUV lithographic objective with 0.33-numerical aperture is taken as an example to illustrate the presented method. The results show that the thermal aberration can be corrected effectively, and the image quality of the thermally deformed system is improved to the initial design level, which proves the availability of the method.

  18. Invisible marking system by extreme ultraviolet radiation: the new frontier for anti-counterfeiting tags

    Science.gov (United States)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2016-07-01

    We present a marking technology which uses extreme ultraviolet radiation to write invisible patterns on tags based on alkali fluoride thin films. The shape of the pattern is pre-determined by a mask (in the case of contact lithography) or by a suitable mirror (projection lithography). Tags marked using this method offer a much better protection against fakes than currently available anti-counterfeiting techniques. The complexity and cost of this technology can be tailored to the value of the good to be protected, leaving, on the other hand, the specific reading technique straightforward. So far, we have exploited our invisible marking to tag artworks, identity cards, electrical components, and containers of radioactive wastes. Advantages and limits of this technology are discussed in comparison with the anti-counterfeiting systems available in the market.

  19. Chirped pulse amplification in an extreme-ultraviolet free-electron laser

    Science.gov (United States)

    Gauthier, David; Allaria, Enrico; Coreno, Marcello; Cudin, Ivan; Dacasa, Hugo; Danailov, Miltcho Boyanov; Demidovich, Alexander; di Mitri, Simone; Diviacco, Bruno; Ferrari, Eugenio; Finetti, Paola; Frassetto, Fabio; Garzella, David; Künzel, Swen; Leroux, Vincent; Mahieu, Benoît; Mahne, Nicola; Meyer, Michael; Mazza, Tommaso; Miotti, Paolo; Penco, Giuseppe; Raimondi, Lorenzo; Ribič, Primož Rebernik; Richter, Robert; Roussel, Eléonore; Schulz, Sebastian; Sturari, Luca; Svetina, Cristian; Trovò, Mauro; Walker, Paul Andreas; Zangrando, Marco; Callegari, Carlo; Fajardo, Marta; Poletto, Luca; Zeitoun, Philippe; Giannessi, Luca; de Ninno, Giovanni

    2016-12-01

    Chirped pulse amplification in optical lasers is a revolutionary technique, which allows the generation of extremely powerful femtosecond pulses in the infrared and visible spectral ranges. Such pulses are nowadays an indispensable tool for a myriad of applications, both in fundamental and applied research. In recent years, a strong need emerged for light sources producing ultra-short and intense laser-like X-ray pulses, to be used for experiments in a variety of disciplines, ranging from physics and chemistry to biology and material sciences. This demand was satisfied by the advent of short-wavelength free-electron lasers. However, for any given free-electron laser setup, a limit presently exists in the generation of ultra-short pulses carrying substantial energy. Here we present the experimental implementation of chirped pulse amplification on a seeded free-electron laser in the extreme-ultraviolet, paving the way to the generation of fully coherent sub-femtosecond gigawatt pulses in the water window (2.3-4.4 nm).

  20. Chirped pulse amplification in an extreme-ultraviolet free-electron laser.

    Science.gov (United States)

    Gauthier, David; Allaria, Enrico; Coreno, Marcello; Cudin, Ivan; Dacasa, Hugo; Danailov, Miltcho Boyanov; Demidovich, Alexander; Di Mitri, Simone; Diviacco, Bruno; Ferrari, Eugenio; Finetti, Paola; Frassetto, Fabio; Garzella, David; Künzel, Swen; Leroux, Vincent; Mahieu, Benoît; Mahne, Nicola; Meyer, Michael; Mazza, Tommaso; Miotti, Paolo; Penco, Giuseppe; Raimondi, Lorenzo; Ribič, Primož Rebernik; Richter, Robert; Roussel, Eléonore; Schulz, Sebastian; Sturari, Luca; Svetina, Cristian; Trovò, Mauro; Walker, Paul Andreas; Zangrando, Marco; Callegari, Carlo; Fajardo, Marta; Poletto, Luca; Zeitoun, Philippe; Giannessi, Luca; De Ninno, Giovanni

    2016-12-01

    Chirped pulse amplification in optical lasers is a revolutionary technique, which allows the generation of extremely powerful femtosecond pulses in the infrared and visible spectral ranges. Such pulses are nowadays an indispensable tool for a myriad of applications, both in fundamental and applied research. In recent years, a strong need emerged for light sources producing ultra-short and intense laser-like X-ray pulses, to be used for experiments in a variety of disciplines, ranging from physics and chemistry to biology and material sciences. This demand was satisfied by the advent of short-wavelength free-electron lasers. However, for any given free-electron laser setup, a limit presently exists in the generation of ultra-short pulses carrying substantial energy. Here we present the experimental implementation of chirped pulse amplification on a seeded free-electron laser in the extreme-ultraviolet, paving the way to the generation of fully coherent sub-femtosecond gigawatt pulses in the water window (2.3-4.4 nm).

  1. Fast resist-activation dosimetry for extreme ultra-violet lithography.

    Science.gov (United States)

    Heo, Jinseok; Xu, Man; Maas, Diederik

    2017-03-06

    Due to the rather broad band emission spectrum of the extremely hot plasma in its extreme ultra-violet (EUV) source, an EUV lithography scanner also projects out-of-band vacuum- and deep-UV (OoB V/DUV) light on the photoresist on a wafer. As this type of uncontrolled and undesirable light can activate resist chemistry, it will impair the critical dimension uniformity of the patterns, especially across the borders of the fields. Hence, OoB V/DUV quantification technology is required in the pre-production phase. For this reason, the systematic characterization of the EUV-source emission spectrum and the spatial profile of the light as projected on the wafer is indispensable to sustain stable integrated circuit production with EUV lithography. This paper introduces an in-band EUV and OoB V/DUV dosimetry method that is based on enhanced energy sensitivity by resist contrast (EESRC). This dosimetry method is applied in an EUV lithography tool to quantitatively analyze the spatial distribution the resist activation by in-band EUV and OoB V/DUV light, under several exposure conditions. This pragmatic approach can replace the current best-practice of measuring the full spectrum of an EUV light source.

  2. Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node

    Science.gov (United States)

    Kim, Guk-Jin; Kim, In-Seon; Lee, Sung-Gyu; Yeung, Michael; Kim, Min-Su; Park, Jin-Goo; Oh, Hye-Keun

    2017-10-01

    Extreme ultraviolet (EUV) pellicles help in the protection of EUV masks from defects, contaminants, and particles during the exposure process. However, a single-stack EUV pellicle can be easily deformed during the exposure process; therefore, multi-stack pellicles have been proposed to minimize the deformation of an EUV pellicle. However, wrinkles can be formed in an EUV pellicle due to extremely thin thickness. In this study, we investigated the impact of these wrinkles on the transmission and critical dimension (CD) variation for the 5- and 3-nm nodes. The 5- and 3-nm nodes can be used by conventional and high numerical aperture (NA) systems, respectively. The variation in the transmission and the allowable local tilt angle of the wrinkle as a function of the wrinkle height and periodicity were calculated. A change in transmission of 2.2% resulted in a 0.2 nm variation in the CD for the anamorphic NA system (3-nm node), whereas a transmission variation of 1.6% caused a 0.2 nm CD variation in the isomorphic NA system (5-nm node).

  3. Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source

    NARCIS (Netherlands)

    Dolgov, A.; Lopaev, D.; Lee, C. J.; Zoethout, E.; Medvedev, V.; Yakushev, O.; F. Bijkerk,

    2015-01-01

    Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiation from a pulsed tin plasma discharge. Our studies show that the film is chemically inert and has characteristics that a

  4. AlGaN-on-Si backside illuminated photodetectors for the extreme ultraviolet (EUV) range

    Science.gov (United States)

    Malinowski, P. E.; Duboz, J.-Y.; John, J.; Sturdevant, C.; Das, J.; Derluyn, J.; Germain, M.; de Moor, P.; Minoglou, K.; Semond, F.; Frayssinet, E.; Hochedez, J.-F.; Giordanengo, B.; van Hoof, C.; Mertens, R.

    2010-04-01

    We report on the fabrication and characterization of solar blind Metal-Semiconductor-Metal (MSM) based photodetectors for use in the extreme ultraviolet (EUV) wavelength range. The devices were fabricated in the AlGaN-on- Si material system, with Aluminum Gallium Nitride (AlGaN) epitaxial layers grown on Si(111) by means of Molecular Beam Epitaxy. The detectors' IV characteristics and photoresponse were measured between 200 and 400 nm. Spectral responsivity was calculated for comparison with the state-of-the-art ultraviolet photodetectors. It reaches the order of 0.1 A/W at the cut-off wavelength of 360 nm, for devices with Au fingers of 3 μm width and spacing of 3 μm. The rejection ratio of visible radiation (400 nm) was more than 3 orders of magnitude. In the additional post-processing step, the Si substrate was removed locally under the active area of the MSM photodetectors using SF6-based Reactive Ion Etching (RIE). In such scheme, the backside illumination is allowed and there is no shadowing of the active layer by the metal electrodes, which is advantageous for the EUV sensitivity. Completed devices were assembled and wire-bonded in customized TO-8 packages with an opening. The sensitivity at EUV was verified at the wavelengths of 30.4 and 58.4 nm using a He-based beamline. AlGaN photodetectors are a promising alternative for highly demanding applications such as space science or modern EUV lithography. The backside illumination approach is suited in particular for large, 2D focal plane arrays.

  5. THE HIGH-RESOLUTION EXTREME-ULTRAVIOLET SPECTRUM OF N{sub 2} BY ELECTRON IMPACT

    Energy Technology Data Exchange (ETDEWEB)

    Heays, A. N. [Leiden Observatory, Leiden University, P.O. Box 9513, 2300 RA Leiden (Netherlands); Ajello, J. M.; Aguilar, A. [Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA 91109 (United States); Lewis, B. R.; Gibson, S. T., E-mail: heays@strw.leidenuniv.nl [Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 (Australia)

    2014-04-01

    We have analyzed high-resolution (FWHM = 0.2 Å) extreme-ultraviolet (EUV, 800-1350 Å) laboratory emission spectra of molecular nitrogen excited by an electron impact at 20 and 100 eV under (mostly) optically thin, single-scattering experimental conditions. A total of 491 emission features were observed from N{sub 2} electronic-vibrational transitions and atomic N I and N II multiplets and their emission cross sections were measured. Molecular emission was observed at vibrationally excited ground-state levels as high as v'' = 17, from the a {sup 1}Π {sub g} , b {sup 1}Π {sub u} , and b'{sup 1}Σ {sub u} {sup +} excited valence states and the Rydberg series c'{sub n} {sub +1} {sup 1}Σ {sub u} {sup +}, c{sub n} {sup 1}Π {sub u} , and o{sub n} {sup 1}Π {sub u} for n between 3 and 9. The frequently blended molecular emission bands were disentangled with the aid of a sophisticated and predictive quantum-mechanical model of excited states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. Improved model parameters describing electronic transition moments were obtained from the experiment and allowed for a reliable prediction of the vibrationally summed electronic emission cross section, including an extrapolation to unobserved emission bands and those that are optically thick in the experimental spectra. Vibrationally dependent electronic excitation functions were inferred from a comparison of emission features following 20 and 100 eV electron-impact collisional excitation. The electron-impact-induced fluorescence measurements are compared with Cassini Ultraviolet Imaging Spectrograph observations of emissions from Titan's upper atmosphere.

  6. First spectral observations of the diffuse background with the Extreme Ultraviolet Explorer

    Science.gov (United States)

    Jelinksy, P.; Vallerga, J. V.; Edelstein, J.

    1995-01-01

    We present the first results from the analysis of the spectroscopic observations of diffuse extreme ultraviolet (EUV) emission taken with the Extreme Ultraviolet Explorer (EUVE) spectrometers in the wavelength range 160-740 A. Although not designed or optimized for diffuse observation, the EUVE spectrometers are the most sensitive diffuse EUV spectrometer in orbit. The spectral resolution for diffuse emission of the medium and long-wavelength spectrometers are 17 and 34 A FWHM, respectively. During the period from 1992 July 25 to 1992 August 19, the spectrometers surveyed a 2 x 20 deg field scanned from (l, b) = (24 deg, -28 deg) to (44 deg, -74 deg) with a total effective exposure time of 575,232 s. The only emission lines detected were those of He I and He II (584, 537, 304 A) with intensities consistent with local geocoronal and/or interplanetary scattering of solar radiation (584 A = 1.30 rayleighs; 537 A = 0.040 R; and 304 A = 0.029 R). Models of the soft X-ray background, which results from a 10(exp 6) K plasma (Local Bubble) surrounding the neutral gas near the Sun (Local Cloud), predict that most of the flux from the hot plasma appears as emission lines in the EUV. We have compared these spectral predictions with our observations to place limits on the emission measure versus temperature of the proposed hot plasma. Using the same plasma model, we derived emissions measures for our data and the C and B soft X-ray bands of the Wisconsin rocket survey. We find that our limits for the plasma emission measure are a factor of 5-10 below the C- and B-band emission measures over the temperature range from 10(exp 5.7) to 10(exp 6.4) K. We explore possible scenarios that could reconcile our results with the X-ray surveys and conclude that depletion or a nonequilibrium plasma state rather than absorption are the more likely explanations of the discrepancy. We also show that our spectrum is inconsistent with the spectrum from the approximately 10(exp 5) K gas at the

  7. Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

    Science.gov (United States)

    Iguchi, Haruki; Hashimoto, Hiraku; Kuki, Masaki; Harada, Tetsuo; Kinoshita, Hiroo; Watanabe, Takeo; Platonov, Yuriy Y.; Kriese, Michael D.; Rodriguez, Jim R.

    2016-06-01

    In extreme-ultraviolet (EUV) lithography, the development of high-power EUV sources is one of the critical issues. The EUV output power directly depends on the collector mirror performance. Furthermore, mirrors with large diameters are necessary to achieve high collecting performance and take sufficient distance to prevent heat and debris from a radiation point of the source. Thus collector mirror development with accurate reflectometer is important. We have developed a large reflectometer at BL-10 beamline of the NewSUBARU synchrotron facility that can be used for mirrors with diameters, thicknesses, and weights of up to 800 mm, 250 mm, and 50 kg, respectively. This reflectometer can measure reflectivity with fully s-polarized EUV light. In this study, we measured the reflectance of a 412-mm-diameter EUV collector mirror using a maximum incident angle of 36°. We obtained the peak reflectance, center wavelength and reflection bandwidth results and compared our results with Physikalisch-Technische Bundesanstalt results.

  8. An analysis of ultraviolet spectra of Extreme Helium Stars and new clues to their origins

    CERN Document Server

    Pandey, G; Jeffery, C S; Rao, N K; Pandey, Gajendra; Lambert, David L.

    2006-01-01

    Abundances of about 18 elements including the heavy elements Y and Zr are determined from Hubble Space Telescope Space Telescope Imaging Spectrograph ultraviolet spectra of seven extreme helium stars (EHes): LSE 78, BD+10 2179, V1920 Cyg, HD 124448, PV Tel, LS IV -1 2, and FQ Aqr. New optical spectra of the three stars -- BD+10 2179, V1920 Cyg, and HD 124448 were analysed. The abundance analyses is done using LTE line formation and LTE model atmospheres especially constructed for these EHe stars. The stellar parameters derived from an EHe's UV spectrum are in satisfactory agreement with those derived from its optical spectrum. Adopted abundances for the seven EHes are from a combination of the UV and optical analyses. Published results for an additional ten EHes provide abundances obtained in a nearly uniform manner for a total of 17 EHes, the largest sample on record. The initial metallicity of an EHe is indicated by the abundance of elements from Al to Ni; Fe is adopted to be the representative of initial m...

  9. Design of broad angular phase retarders for the complete polarization analysis of extreme ultraviolet radiation

    Science.gov (United States)

    Lin, Cheng-You; Chen, Shu-Jing; Chen, Zhao-Yang; Ding, Ying-Chun

    2015-11-01

    A method of designing broad angular phase retarders in the extreme ultraviolet (EUV) region is presented. The design is based on a standard Levenberg-Marquardt algorithm combined with a common merit function. Using this method, a series of broad angular EUV phase retarders were designed using aperiodic Mo/Si multilayers. At photon energy of 90 eV, broad angular phase retarders with 30°, 60°, and 90° phase retardations have been realized in the angular range of 39°-51°. By analyzing and comparing the performances of the designed broad angular phase retarders, we found that the Mo/Si multilayer with more layers could obtain higher phase retardation in broader angular range when used to design the broad angular phase retarder. Broad angular phase retarders possess lower sensitivity toward changing incident angle compared with the traditional phase retarders designed with transmission periodic multilayers, and can be used for the polarization control of broad angular EUV sources. Project supported by the Fundamental Research Funds for the Central Universities, China (Grant Nos. JD1517, ZY1349, and 2652014012).

  10. Extreme ultraviolet interferometry of laser plasma material between the critical and ablation surfaces

    Science.gov (United States)

    Gartside, L. M. R.; Tallents, G. J.; Rossall, A. K.; Wagenaars, E.; Whittaker, D. S.; Kozlová, M.; Nejdl, J.; Sawicka, M.; Polan, J.; Kalal, M.; Rus, B.

    2011-06-01

    Interferometric probing using an extreme ultraviolet (EUV) laser has measured both transmission and phase information through laser-irradiated plastic (parylene-N C 8H 8) targets (thickness 350 nm). Unusually, the probe beam is incident longitudinally in approximately the same direction as the incident optical laser. Agreement of the experimental interferometry results has been obtained with two-dimensional radiation hydrodynamic code (h2d) simulations of EUV (21.2 nm) probe transmissions and phase shifts. We show that the transmission of the EUV probe beam provides a measure of the rate of target ablation, as ablated plasma becomes close to transparent when the photon energy is less than the ionization energy of the predominate ion species. Here C 3+ ions with ionization energy 64.5 eV are transparent, while lower carbon ionization stages, present in the unablated target and close to the ablation surface, absorb the 58.5 eV photons. Similarly, we show that refractive indices η below the solid parylene-N ( ηsolid = 0.946) and expected plasma values are produced in the warm dense plasma created by laser irradiation due to bound-free absorption in C +.

  11. Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture

    Energy Technology Data Exchange (ETDEWEB)

    Anderson, Christopher N.; Naulleau, Patrick P.

    2008-06-02

    The deprotection blur of Rohm and Haas XP 5435, XP 5271, and XP5496 extreme ultraviolet photoresists has been determined as their base weight percent is varied. They have also determined the deprotection blur of TOK EUVR P1123 photoresist as the post-exposure bake temperature is varied from 80 C to 120 C. In Rohm and Haas XP 5435 and XP5271 resists 7x and 3x (respective) increases in base weight percent reduce the size of successfully patterned 1:1 line-space features by 16 nm and 8 nm with corresponding reductions in deprotection blur of 7 nm and 4 nm. In XP 5496 a 7x increase in base weight percent reduces the size of successfully patterned 1:1 line-space features from 48 nm to 38 nm without changing deprotection blur. In TOK EUVR P1123 resist, a reduction in post-exposure bake temperature from 100 C to 80 C reduces deprotection blur from 21 nm to 10 nm and reduces patterned LER from 4.8 nm to 4.1 nm.

  12. Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology

    Science.gov (United States)

    Helfenstein, Patrick; Mohacsi, Istvan; Rajeev, Rajendran; Ekinci, Yasin

    2016-07-01

    For the successful implementation of extreme ultraviolet (EUV) lithography in the upcoming technology nodes, a major challenge to overcome is the stable and reliable detection and characterization of mask defects. We have recently presented a reflective mode EUV mask scanning lensless imaging tool (RESCAN) which was installed at the XIL-II beamline of the swiss light source and showed reconstructed aerial images of test patterns on EUV masks. RESCAN uses scanning coherent diffractive imaging (SCDI) methods to obtain actinic aerial images of EUV photomasks and was designed for 80 nm onmask resolution. Our SCDI algorithm reconstructs the measured sample by iteratively solving the phase problem using overdetermined diffraction data gathered by scanning across the specimen with a finite illumination. It provides the phase and amplitude aerial images of EUV photomasks with high resolution without the need to use high numerical aperture (NA) lenses. Contrary to scanning microscopy and full-field microscopy, where the resolution is limited by the spot size or NA of the lens, the achievable resolution with our method depends on the detector noise and NA of the detector. To increase the resolution of our tool, we upgraded RESCAN with a detector and algorithms. Here, we present the results obtained with the tool that is capable of up to 40-nm onmask resolution. We believe that the realization of our prototype marks a significant step toward overcoming the limitations imposed by methods relying on imaging optics and shows a viable solution for actinic mask metrology.

  13. Hinode/Extreme-Ultraviolet Imaging Spectrometer Observations of the Temperature Structure of the Quiet Corona

    CERN Document Server

    Brooks, David H; Williams, David R; Watanabe, Tetsuya

    2009-01-01

    We present a Differential Emission Measure (DEM) analysis of the quiet solar corona on disk using data obtained by the Extreme-ultraviolet Imaging Spectrometer (EIS) on Hinode. We show that the expected quiet Sun DEM distribution can be recovered from judiciously selected lines, and that their average intensities can be reproduced to within 30%. We present a subset of these selected lines spanning the temperature range log T = 5.6 to 6.4 K that can be used to derive the DEM distribution reliably, including a subset of Iron lines that can be used to derive the DEM distribution free of the possibility of uncertainties in the elemental abundances. The subset can be used without the need for extensive measurements and the observed intensities can be reproduced to within the estimated uncertainty in the pre-launch calibration of EIS. Furthermore, using this subset, we also demonstrate that the quiet coronal DEM distribution can be recovered on size scales down to the spatial resolution of the instrument (1" pixels...

  14. Classification of mini-dimmings associated with extreme ultraviolet eruptions by using graph theory

    Directory of Open Access Journals (Sweden)

    S Bazargan

    2016-09-01

    Full Text Available Coronal dimmings in both micro and macro scales, can be observed by extreme ultraviolet images, recorded from Solar Dynamics Observatory or Atmospheric Imaging Assembly (SDO/AIA. Mini-dimmings are sometimes associated with wave-like brightening, called coronal mass ejections. Here, the sun full disk images with 171 Å wavelenght, cadence of 2.5, and  0.6 arcsec cell size, were taken on 3 March 2012, then the obtained data were analyzed. Using Zernike Moment and Support Vector Machine (SVM, mini dimmings are detected. 538 active region events, 680 coronal hole events and 723 quiet sun events have been recognized using algorithm. The position, time duration and spatial expansion of these events were computed .The eruptive dimmings have a more spatial development than thermal dimmings after eruptions. This is evident in their graph characteristics length. Then, using graph theory, eruptive and thermal mini-dimmings were classified, with 13% error, for 200 dimmings. 68 dimmings were classified as thermal, and 132 as eruptive. To do this, evolution of graph characteristic length were used.

  15. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    Science.gov (United States)

    Malinowski, Pawel E.; Duboz, Jean-Yves; De Moor, Piet; Minoglou, Kyriaki; John, Joachim; Horcajo, Sara Martin; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Esposito, Marco; Giordanengo, Boris; BenMoussa, Ali; Mertens, Robert; Van Hoof, Chris

    2011-04-01

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  16. The Extreme Ultraviolet Imagers (EUVIs): Earth-observing telescopes on International Space Station

    Science.gov (United States)

    Uji, Kentaro; Yoshikawa, Ichiro; Yoshioka, Kazuo; Murakami, Go; Yamazaki, Atsushi

    2012-11-01

    The Extreme Ultraviolet Imagers (EUVIs) were launched on 21st July 2012 as payloads to the Exposed Facility of the Japanese Experiment Module (JEM-EF) on the International Space Station. The EUVIs are parts of the IMAP (Ionosphere, Mesosphere, upper Atmosphere, and Plasmasphere mapping) mission to observe the Earth's upper atmosphere, mesosphere, ionosphere, thermosphere and plasmasphere. The other part of IMAP is a visible and near-infrared spectral imager (VISI). In this mission, we install two independent and identical telescopes. One telescope detects the terrestrial EUV emission from O+ (at the wavelength of 83.4 nm), and the other one detects He+ (30.4 nm). At the altitude of approximately 400 km, the two telescopes direct towards the Earth's limb to look at the ionosphere and plasmasphere from the inside-out. The maximum spatial resolution is 0.1° and time resolution is 1 minute. The optical instruments consist of multilayer coated mirrors which are optimized for 30.4 nm, metallic thin filters and 5-stage microchannel plates to pick up photon events efficiently. In our presentation, we report the mission overview, the instruments and the result of ground calibrations.

  17. Fabrication of diffractive optical components for an extreme ultraviolet shearing interferometer

    Energy Technology Data Exchange (ETDEWEB)

    Spector, S.J. (Department of Physics, State University of New York at Stony Brook, Stony Brook, New York 11794 (United States)); Tennant, D.M. (AT T Bell Laboratories, Holmdel, New Jersey 07733 (United States)); Tan, Z. (AT T Bell Laboratories, 510E Brookhaven National Laboratory, Upton, New York 11973 (United States)); Bjorkholm, J.E. (AT T Bell Laboratories, Holmdel, New Jersey 07733 (United States))

    1994-11-01

    We have constructed four optical components for use in an extreme ultraviolet shearing interferometer which will operate at a wavelength of 13.4 nm. The components that have been constructed include transmission diffractive optical components such as a Fresnel zone plate, angled gratings, and two-frequency gratings, as well as pinhole apertures. All the components are fabricated in 110 nm of Ge, which is supported by a 0.5--0.7-[mu]m-thick membrane of Si. The patterns were fabricated by first evaporating Ge and then spinning 100 nm polymethylmethacrylate (PMMA) onto the Si membranes. The desired patterns were exposed in the PMMA resist using electron beam lithography. Custom interative computer programs generated the patterns used to control the exposure. After developing the PMMA resist the Ge layer was etched using a reactive ion etching technique. Electron microscopy of the finished components show that the smallest features in our components are cleanly constructed, and the linewidths and placement of the features meet the desired accuracy.

  18. Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Kjornrattanawanich, B; Bajt, S

    2004-05-20

    We observe a dramatic dependence of the extreme ultraviolet (EUV) reflectivity of Mo/Y multilayers on the oxygen content of yttrium. This is explained by a change in microstructure, increase in roughness of the Y layers and not by an increase in absorption due to oxygen in Y layers. We find best reflectivity of 38.4% is achieved with an oxygen content of 25%, which reduces to 32.6% and 29.6% for multilayers manufactured from oxygen free yttrium and 39%-oxygen yttrium, respectively. These results highlight the importance of experimentally determined optical constants as well as interface roughness in multilayer calculations. In addition, lifetime stability of Mo/Y multilayers with different capping layers was monitored for one year. The molybdenum- and palladium-capped samples exhibited low surface roughness and about 4% relative reflectivity loss in one year. The relative reflectivity loss on yttrium-capped sample (yttrium with 39% oxygen) was about 8%. However, the reflectivity loss in all three capping layers occurred within the first 100 days after the deposition and the reflectivity remained stable afterwards.

  19. Visualizing the local optical response to extreme-ultraviolet radiation with a resolution of λ/380

    Science.gov (United States)

    Tamasaku, Kenji; Sawada, Kei; Nishibori, Eiji; Ishikawa, Tetsuya

    2011-09-01

    Scientists have continually tried to improve the spatial resolution of imaging ever since the invention of the optical microscope in around 1610 by Galileo. Recently, a spatial resolution near λ/10 was achieved in a near-field scheme by using surface plasmon polaritons. However, further improvement in this direction is hindered by the size of metallic nanostructures. Here we show that atom-scale resolution is achievable in the extreme-ultraviolet region by using X-ray parametric down-conversion, which detaches the achievable resolution from the wavelength of the probe light. We visualize three-dimensionally the local optical response of diamond at wavelengths between 103 and 206Å with a resolution as fine as 0.54Å. This corresponds to a resolution from λ/190 to λ/380, an order of magnitude better than ever achieved. Although the present study focuses on the relatively high-energy optical regions, our method could be extended into the visible region using advanced X-ray sources, and would open a new window into the optical properties of solids.

  20. Opto-mechanisms design of extreme-ultraviolet camera onboard Chang E lunar lander.

    Science.gov (United States)

    Li, Zhaohui; Chen, Bo; Song, Kefei; Wang, Xiaodong; Liu, Shijie; Yang, Liang; Hu, Qinglong; Qiao, Ke; Zhang, Liping; Wu, Guodong; Yu, Ping

    2014-06-30

    The extreme-ultraviolet camera mounted on the Lander of China Chang-E lunar exploration project launched in 2013 is the first instrument used to imaging from the lunar surface to the whole plasmasphere around the earth. Taking into account both the lunar environment conditions and the weight and volume constraints, a single spherical mirror and a spherical microchannel plate detector make up the compact optical system. An optimized opto-mechanical design was presented using Finite Element Analysis Model, and the detail design for the important assemblies of the 2-axis platform, the primary mirror, the aperture door mechanism and MCP detector were all specially addressed for their environmental adaptability and reliability. Tests of mechanical characteristics have demonstrated that the position and pointing accuracy and its stability meets the operation requirements of 2'. Vibration results have shown that the EUVC has adequate stiffness and strength safety margin to survive in launch and the moon environments. The imaging performance with the resolution of 0.08° is measured after vibration, in agreement with the predicted performance.

  1. Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology

    Science.gov (United States)

    Vinokhodov, A. Yu.; Krivokorytov, M. S.; Sidelnikov, Yu. V.; Krivtsun, V. M.; Medvedev, V. V.; Koshelev, K. N.

    2016-10-01

    We report on the development of a high brightness source of extreme ultraviolet radiation (EUV) with a working wavelength of 13.5 nm. The source is based on a laser-produced plasma driven by pulsed radiation of a Nd:YAG laser system. Liquid droplets of Sn-In eutectic alloy were used as the source fuel. The droplets were created by a droplet generator operating in the jet break-up regime. The EUV emission properties of the plasma, including the emission spectrum, time profile, and conversion efficiency of laser radiation into useful 13.5 nm photons, have been characterized. Using the shadowgraphy technique, we demonstrated the production of corpuscular debris by the plasma source and the influence of the plasma on the neighboring droplet targets. The high-frequency laser operation was simulated by usage of the dual pulse regime. Based on the experimental results, we discuss the physical phenomena that could affect the source operation at high repetition rates. Finally, we estimate that an average source brightness of 1.2 kW/mm2 sr is feasible at a high repetition rate.

  2. Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    Energy Technology Data Exchange (ETDEWEB)

    Madey, Theodore E. [Department of Physics and Astronomy, Laboratory for Surface Modification, Rutgers, State University of New Jersey, Piscataway, NJ 08854-8019 (United States)]. E-mail: madey@physics.rutgers.edu; Faradzhev, Nadir S. [Department of Physics and Astronomy, Laboratory for Surface Modification, Rutgers, State University of New Jersey, Piscataway, NJ 08854-8019 (United States); Yakshinskiy, Boris V. [Department of Physics and Astronomy, Laboratory for Surface Modification, Rutgers, State University of New Jersey, Piscataway, NJ 08854-8019 (United States); Edwards, N.V. [EUV Lithography Strategy Group, SEMATECH, 2706 Montopolis Dr., Austin, TX 78741-6499 (United States)

    2006-12-15

    One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films {approx}2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H{sub 2}O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.

  3. Comparative study of line roughness metrics of chemically amplified and inorganic resists for extreme ultraviolet

    Science.gov (United States)

    Fallica, Roberto; Buitrago, Elizabeth; Ekinci, Yasin

    2016-07-01

    We present a comprehensive comparative study of the roughness metrics of different resists. Dense line/space of polymethyl methacrylate, hydrogen silsesquioxane, a metal oxide-based resist, and different chemically amplified resists (CARs) have been patterned by extreme ultraviolet interference lithography. All three line width roughness (LWR) metrics: the root-mean-square (r.m.s.) roughness value σLWR, the correlation length ξ, and the roughness exponent α, were extracted by metrological analysis of top-down SEM images. We found that all metrics are required to fully describe the overall roughness of each resist. Our measurements indicate that in fact, a few of the state-of-the-art resists tested here can meet the International Technology Roadmap for Semiconductors requirements for σLWR. The correlation length ξ was also found to be considerably higher in polymer-based materials in comparison to nonpolymers. Finally, the roughness exponent α, interpreted using the concept of fractal geometry, was found to be mainly affected by acid diffusion in CARs, where it produces line edges with a higher complexity than in non-CAR resists. These results indicate that the different resists platforms show very different LWR metrics and roughness is not manifested only in the σLWR but in all parameters. Therefore, all roughness metrics should be taken into account when comparing the performance among different resists since they ultimately have a substantial impact on device performance.

  4. On the Nature of the Extreme-Ultraviolet Late Phase of Solar Flares

    CERN Document Server

    Li, Y; Guo, Y; Dai, Y

    2014-01-01

    The extreme-ultraviolet (EUV) late phase of solar flares is a second peak of warm coronal emissions (e.g., Fe XVI) for many minutes to a few hours after the GOES soft X-ray peak. It was first observed by the EUV Variability Experiment (EVE) on board the Solar Dynamics Observatory (SDO). The late phase emission originates from a second set of longer loops (late phase loops) that are higher than the main flaring loops. It is suggested as being caused by either additional heating or long-lasting cooling. In this paper, we study the role of long-lasting cooling and additional heating in producing the EUV late phase using the "enthalpy-based thermal evolution of loops" (EBTEL) model. We find that a long cooling process in late phase loops can well explain the presence of the EUV late phase emission, but we cannot exclude the possibility of additional heating in the decay phase. Moreover, we provide two preliminary methods based on the UV and EUV emissions from the Atmospheric Imaging Assembly (AIA) on board SDO to...

  5. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks

    Science.gov (United States)

    Qi, Zhengqing John; Rankin, Jed; Narita, Eisuke; Kagawa, Masayuki

    2016-04-01

    Several challenges hinder extreme ultraviolet lithography (EUVL) photomask fabrication and its readiness for high-volume manufacturing (HVM). The lack in availability of pristine defect-free blanks as well as the absence of a robust mask repair technique mandates defect mitigation through pattern shift for the production of defect-free photomasks. By using known defect locations on a blank, the mask design can be intentionally shifted to avoid patterning directly over a defect. The work presented here provides a comprehensive look at pattern shift implementation to intersect EUV HVM for the 7-nm technology node (N7). An empirical error budget to compensate for various measurement errors, based on the latest HVM inspection and write tool capabilities, is first established and then verified postpatterning. The validated error budget is applied to 20 representative EUV blanks and pattern shift is performed using fully functional N7 chip designs that were recently used to fabricate working silicon-germanium devices. Probability of defect-free masks are explored for various N7 photomask levels, including metal, contact, and gate cut layers. From these results, an assessment is made on the current viability of defect-free EUV masks and what is required to construct a complete defect-free EUV mask set.

  6. Design considerations of 10 kW-scale, extreme ultraviolet SASE FEL for lithography

    CERN Document Server

    Pagani, C; Schneidmiller, E A; Yurkov, M V

    2001-01-01

    The semiconductor industry growth is driven to a large extent by steady advancements in microlithography. According to the newly updated industry road map, the 70 nm generation is anticipated to be available in the year 2008. However, the path to get there is not clear. The problem of construction of extreme ultraviolet (EUV) quantum lasers for lithography is still unsolved: progress in this field is rather moderate and we cannot expect a significant breakthrough in the near future. Nevertheless, there is clear path for optical lithography to take us to sub-100 nm dimensions. Theoretical and experimental work in Self-Amplified Spontaneous Emission (SASE) Free Electron Lasers (FEL) physics and the physics of superconducting linear accelerators over the last 10 years has pointed to the possibility of the generation of high-power optical beams with laser-like characteristics in the EUV spectral range. Recently, there have been important advances in demonstrating a high-gain SASE FEL at 100 nm wavelength (J. Andr...

  7. The Extreme Ultraviolet Deficit and Magnetically Arrested Accretion in Radio Loud Quasars

    CERN Document Server

    Punsly, Brian

    2014-01-01

    The Hubble Space Telescope composite quasar spectra presented in Telfer et al. show a significant deficit of emission in the extreme ultraviolet (EUV) for the radio loud component of the quasar population (RLQs), compared to the radio quiet component of the quasar population (RQQs). The composite quasar continuum emission between 1100 \\AA\\, and $\\sim$580 \\AA\\, is generally considered to be associated with the innermost regions of the accretion flow onto the central black hole. The deficit between 1100 \\AA\\, and 580 \\AA\\, in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. It is proposed that this can be the result of islands of large scale magnetic flux in RLQs that are located close to the central black hole that remove energy from the accretion flow as Poynting flux (sometimes called magnetically arrested accretion). These magnetic islands are natural sites for launching relativistic jets. Based on the Telfer et al. da...

  8. Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source

    Science.gov (United States)

    Vinokhodov, A.; Krivokorytov, M.; Sidelnikov, Yu.; Krivtsun, V.; Medvedev, V.; Bushuev, V.; Koshelev, K.; Glushkov, D.; Ellwi, S.

    2016-10-01

    We present the results of the low-melting liquid metal droplets generation based on excited Rayleigh jet breakup. We discuss on the operation of the industrial and in-house designed and manufactured dispensing devices for the droplets generation. Droplet diameter can be varied in the range of 30-90 μm. The working frequency of the droplets, velocity, and the operating temperature were in the ranges of 20-150 kHz, 4-15 m/s, and up to 250 °C, respectively. The standard deviations for the droplet center of mass position both their diameter σ < 1 μm at the distance of 45 mm from the nozzle. Stable operation in the long-term (over 1.5 h) was demonstrated for a wide range of the droplet parameters: diameters, frequencies, and velocities. Physical factors affecting the stability of the generator operation have been identified. The technique for droplet synchronization, allowing using the droplet as a target for laser produced plasma, has been created; in particular, the generator has been successfully used in a high brightness extreme ultraviolet (EUV) light source. The operation with frequency up to 8 kHz was demonstrated as a result of the experimental simulation, which can provide an average brightness of the EUV source up to ˜1.2 kW/mm2 sr.

  9. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

    Energy Technology Data Exchange (ETDEWEB)

    WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K.; KINCY,MARK A.; TICHENOR,DANIEL A.; WILLIAMS,MARK E.; BISCHOFF,PAUL

    2000-01-27

    This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

  10. Compact 13.5-nm free-electron laser for extreme ultraviolet lithography

    Directory of Open Access Journals (Sweden)

    Y. Socol

    2011-04-01

    Full Text Available Optical lithography has been actively used over the past decades to produce more and more dense integrated circuits. To keep with the pace of the miniaturization, light of shorter and shorter wavelength was used with time. The capabilities of the present 193-nm UV photolithography were expanded time after time, but it is now believed that further progress will require deployment of extreme ultraviolet (EUV lithography based on the use of 13.5-nm radiation. However, presently no light source exists with sufficient average power to enable high-volume manufacturing. We report here the results of a study that shows the feasibility of a free-electron laser EUV source driven by a multiturn superconducting energy-recovery linac (ERL. The proposed 40×20  m^{2} facility, using MW-scale consumption from the power grid, is estimated to provide about 5 kW of average EUV power. We elaborate the self-amplified spontaneous emission (SASE option, which is presently technically feasible. A regenerative-amplifier option is also discussed. The proposed design is based on a short-period (2–3 cm undulator. The corresponding electron beam energy is about 0.5–1.0 GeV. The proposed accelerator consists of a photoinjector, a booster, and a multiturn ERL.

  11. Identification and Plasma Diagnostics Study of Extreme Ultraviolet Transitions in Highly Charged Yttrium

    Directory of Open Access Journals (Sweden)

    Roshani Silwal

    2017-09-01

    Full Text Available Extreme ultraviolet spectra of the L-shell ions of highly charged yttrium (Y 26 + –Y 36 + were observed in the electron beam ion trap of the National Institute of Standards and Technology using a flat-field grazing-incidence spectrometer in the wavelength range of 4 nm-20 nm. The electron beam energy was systematically varied from 2.3 keV–6.0 keV to selectively produce different ionization stages. Fifty-nine spectral lines corresponding to Δ n = 0 transitions within the n = 2 and n = 3 shells have been identified using detailed collisional-radiative (CR modeling of the non-Maxwellian plasma. The uncertainties of the wavelength determinations ranged between 0.0004 nm and 0.0020 nm. Li-like resonance lines, 2s– 2 p 1 / 2 and 2s–2 p 3 / 2 , and the Na-like D lines, 3s– 3 p 1 / 2 and 3s– 3 p 3 / 2 , have been measured and compared with previous measurements and calculations. Forbidden magnetic dipole (M1 transitions were identified and analyzed for their potential applicability in plasma diagnostics using large-scale CR calculations including approximately 1.5 million transitions. Several line ratios were found to show strong dependence on electron density and, hence, may be implemented in the diagnostics of hot plasmas, in particular in fusion devices.

  12. Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

    Energy Technology Data Exchange (ETDEWEB)

    Roy, Amitava, E-mail: roy@fzu.cz, E-mail: aroy@barc.gov.in [School of Nuclear Engineering and Center for Materials Under Extreme Environment(CMUXE), Purdue University, West Lafayette, Indiana 47907 (United States); HiLASE Project, Department of Diode-pumped Lasers, Institute of Physics of the ASCR, Na Slovance 2, 18221 Prague (Czech Republic); Murtaza Hassan, Syed; Harilal, Sivanandan S.; Hassanein, Ahmed [School of Nuclear Engineering and Center for Materials Under Extreme Environment(CMUXE), Purdue University, West Lafayette, Indiana 47907 (United States); Endo, Akira; Mocek, Tomas [HiLASE Project, Department of Diode-pumped Lasers, Institute of Physics of the ASCR, Na Slovance 2, 18221 Prague (Czech Republic)

    2014-05-15

    We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

  13. The Extreme Ultraviolet Contributions to the Solar Irradiance Reference Spectrum (SIRS)

    Science.gov (United States)

    Chamberlin, P. C.; Woods, T. N.; Harder, J. W.; Hock, R. A.; Snow, M.

    2008-12-01

    The Whole Heliosphere Interval (WHI) was a coordinated effort with inputs from over 50 models and observatories, both satellite and ground based, to characterize the Sun and heliosphere during solar minimum conditions. The time period selected for this quiet Sun WHI campaign was April 10-16, 2008. One of the goals of the solar minimum WHI was to produce a definitive Solar Irradiance Reference Spectrum (SIRS) for quiet Sun conditions ranging in wavelength from 0.1 nm up to 2400 nm. During this WHI campaign on April 14, 2008, a sounding rocket was launched from White Sands Missile Range that observed the solar spectral irradiance in these solar minimum conditions in the extreme ultraviolet (EUV) wavelength range from 0.1-106 nm as well as the bright hydrogen Lyman alpha emission at 121.6 nm. The rocket observations from 6.0-106.0 nm and at 0.1 nm spectral resolution are the EUV input for the SIRS. These rocket EUV measurements are discussed following a brief introduction to the entire SIRS spectrum developed for the WHI campaign.

  14. Generation, temporal characterization and applications of femtosecond-/ attosecond extreme ultraviolet pulses

    Science.gov (United States)

    Thomann, Isabell

    The work of this thesis is arranged into three parts: (A) Generation and temporal characterization of extreme ultraviolet (EUV) attosecond pulses. In this work I present the generation and first temporal characterization of sub-optical cycle EUV radiation generated in a noble-gas filled hollow-core waveguide. Two regimes of EUV radiation were characterized, ranging from 200 attoseconds to ˜ 1 femtosecond in duration. The first regime that was characterized distinguishes itself from EUV radiation generated by other methods by its narrow (˜ 1 eV) spectral width, its simple energy tunability and its temporal confinement to ˜ 1 femtosecond. In the second regime, single isolated pulses of 200 attoseconds duration (and accordingly larger bandwidth) were generated. In both regimes dynamic phase-matching effects create an extremely short time window within which efficient nonlinear conversion is possible, while it is suppressed outside this window. Temporal characterization of the generated EUV pulses was approached by two-color pump-probe photoelectron spectroscopy. Therefore an efficient photoelectron spectrometer was set up, detecting electrons in a 2pi collection angle. For the interpretation of the experimental data, an analytical model as well as an iterative algorithm were developed, to allow extraction of complex EUV waveforms. The demonstrated radiation will allow for time-resolved studies of the fastest processes in molecules and condensed matter, while at the same time ensuring adequate energy resolution for addressing individual electronic states. (B) Application of a COLTRIMS reaction microscope in combination with femtosecond EUV pulses to questions in molecular physics. The combination of the sensitive detection capabilities of a COLTRIMS reaction microscope with the high time resolution of pump-probe experiments using femtosecond extreme-ultraviolet pulses makes it possible to answer very fundamental open questions in molecular physics such as the

  15. Matter under extreme conditions probed by a seeded free-electron-laser

    Energy Technology Data Exchange (ETDEWEB)

    Bencivenga, F.; Principi, E.; Cucini, R.; Danailov, M. B.; Demidovich, A.; D’Amico, F.; Di Fonzo, S.; Gessini, A.; Kurdi, N.; Mahne, N.; Raimondi, L.; Zangrando, M.; Masciovecchio, C. [Elettra-Sincrotrone Trieste S.C.p.A., S.S. 14 km 163,5 in AREA Science Park, 34149 Basovizza (Italy); Giangrisostomi, E.; Battistoni, A.; Svetina, C. [Elettra-Sincrotrone Trieste S.C.p.A., S.S. 14 km 163,5 in AREA Science Park, 34149 Basovizza (Italy); Dipartimento di Fisica, Universita di Trieste, Piazzale Europa, 34127 Trieste (Italy); Di Cicco, A.; Gunnella, R.; Hatada, K. [CNISM, Dipartimento di Fisica, Universita' di Camerino, Via Madonna delle Carceri, 62032 Camerino (Italy); Filipponi, A. [Dipartimento di Scienze Fisiche e Chimiche, Universita' dell’Aquila, Via Vetoio, 67100 L’Aquila (Italy); and others

    2015-08-17

    FERMI is the first user dedicated seeded free-electron-laser (FEL) working in the extreme ultraviolet (XUV) and soft x-ray range. The EIS-TIMEX experimental end-station was availabe to external users since from the beginning of the user operation of the facility, in Dicember 2012. EIS-TIMEX has been conceived to exploit the unique properties of the FERMI source to study matter under extreme and metastable thermodynamic conditions. We hereby report on its basic parameters and applications, which includes very low jitter (i.e., high time resolution) pump-probe measurements.

  16. Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications.

    Science.gov (United States)

    Reddy, Pulikanti Guruprasad; Pal, Satyendra Prakash; Kumar, Pawan; Pradeep, Chullikkattil P; Ghosh, Subrata; Sharma, Satinder K; Gonsalves, Kenneth E

    2017-01-11

    The present report demonstrates the potential of a polyarylenesulfonium polymer, poly[methyl(4-(phenylthio)-phenyl)sulfoniumtrifluoromethanesulfonate] (PAS), as a versatile nonchemically amplified negative tone photoresist for next-generation lithography (NGL) applications starting from i-line (λ ∼ 365 nm) to extreme ultraviolet (EUV, λ ∼ 13.5 nm) lithography. PAS exhibited considerable contrast (γ), 0.08, toward EUV and patterned 20 nm features successfully.

  17. Capillary Discharge XUV Radiation Source

    Directory of Open Access Journals (Sweden)

    M. Nevrkla

    2009-01-01

    Full Text Available A device producing Z-pinching plasma as a source of XUV radiation is described. Here a ceramic capacitor bank pulse-charged up to 100 kV is discharged through a pre-ionized gas-filled ceramic tube 3.2 mm in diameter and 21 cm in length. The discharge current has amplitude of 20 kA and a rise-time of 65 ns. The apparatus will serve as experimental device for studying of capillary discharge plasma, for testing X-ray optics elements and for investigating the interaction of water-window radiation with biological samples. After optimization it will be able to produce 46.9 nm laser radiation with collision pumped Ne-like argon ions active medium. 

  18. Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

    Science.gov (United States)

    Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

    2012-09-01

    The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition

  19. Determining the polarization state of an extreme ultraviolet free-electron laser beam using atomic circular dichroism.

    Science.gov (United States)

    Mazza, T; Ilchen, M; Rafipoor, A J; Callegari, C; Finetti, P; Plekan, O; Prince, K C; Richter, R; Danailov, M B; Demidovich, A; De Ninno, G; Grazioli, C; Ivanov, R; Mahne, N; Raimondi, L; Svetina, C; Avaldi, L; Bolognesi, P; Coreno, M; O'Keeffe, P; Di Fraia, M; Devetta, M; Ovcharenko, Y; Möller, Th; Lyamayev, V; Stienkemeier, F; Düsterer, S; Ueda, K; Costello, J T; Kazansky, A K; Kabachnik, N M; Meyer, M

    2014-04-16

    Ultrafast extreme ultraviolet and X-ray free-electron lasers are set to revolutionize many domains such as bio-photonics and materials science, in a manner similar to optical lasers over the past two decades. Although their number will grow steadily over the coming decade, their complete characterization remains an elusive goal. This represents a significant barrier to their wider adoption and hence to the full realization of their potential in modern photon sciences. Although a great deal of progress has been made on temporal characterization and wavefront measurements at ultrahigh extreme ultraviolet and X-ray intensities, only few, if any progress on accurately measuring other key parameters such as the state of polarization has emerged. Here we show that by combining ultra-short extreme ultraviolet free electron laser pulses from FERMI with near-infrared laser pulses, we can accurately measure the polarization state of a free electron laser beam in an elegant, non-invasive and straightforward manner using circular dichroism.

  20. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation

    Science.gov (United States)

    Plötzing, M.; Adam, R.; Weier, C.; Plucinski, L.; Eich, S.; Emmerich, S.; Rollinger, M.; Aeschlimann, M.; Mathias, S.; Schneider, C. M.

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  1. Structure and extreme ultraviolet performance of Si/C multilayers deposited under different working pressures.

    Science.gov (United States)

    Yi, Qiang; Huang, Qiushi; Wang, Xiangmei; Yang, Yang; Yang, Xiaowei; Zhang, Zhong; Wang, Zhanshan; Xu, Rongkun; Peng, Taiping; Zhou, Hongjun; Huo, Tonglin

    2017-02-01

    Narrow bandwidth Si/C multilayer mirrors are fabricated and characterized for the Z-pinch plasma diagnostic at a wavelength of 16.5 nm. To reduce the large stress of the multilayer and maintain a practical reflectivity, different working pressures, from 0.13 Pa to 0.52 Pa, are optimized during the deposition. The grazing incidence x-ray reflectometry (GIXR) measurement and the fitting results indicate that an interlayer was formed at the interfaces, while both the interlayer thickness and interface widths increase with larger working pressure. The surface roughness of the multilayers also increases from 0.13 nm at 0.13 Pa to 0.29 nm at 0.52 Pa, as revealed by the atomic force microscope (AFM) measurements. The multilayer stress decreases from -682 MPa to -384  MPa as the working pressure increases from 0.13 Pa to 0.52 Pa, respectively. The experimental extreme ultraviolet (EUV) reflectivity of the samples with 20 bilayers gradually decreased from 26.3% to 18.9% with increased working pressure. The bandwidth of the reflection peak remains similar for the different samples with a full width half-maximum (FWHM) value of around 0.87 nm. A maximum EUV reflectivity of 33.2% and a bandwidth of 0.64 nm were achieved by the sample with 50 bilayers fabricated under a working pressure of 0.13 Pa.

  2. Near infrared and extreme ultraviolet light pulses induced modifications of ultrathin Co films

    Directory of Open Access Journals (Sweden)

    Jan Kisielewski

    2017-05-01

    Full Text Available We report on comparative study of magnetic properties of Pt/Co/Pt trilayers after irradiation with different light sources. Ultrathin Pt/Co/Pt films were deposited by molecular beam epitaxy technique on sapphire (0001 substrates. Pt buffers were grown at room temperature (RT and at 750°C (high temperature, HT. The samples were irradiated with a broad range of light energy densities (up to film ablation using two different single pulse irradiation sources: (i 40 fs laser with 800 nm wavelength and (ii 3 ns laser-plasma source of extreme ultraviolet (EUV with the most intense emission centered at 11 nm. The light pulse-driven irreversible structural and as a consequence, magnetic modifications were investigated using polar magneto-optical Kerr effect-based microscopy and atomic and magnetic force microscopies. The light pulse-induced transitions from the out-of-plane to in-plane magnetization state, and from in-plane to out-of-plane, were observed for both types of samples and irradiation methods. Diagrams of the magnetic states as a function of the Co layer thickness and energy density of the absorbed femtosecond pulses were constructed for the samples with both the RT and HT buffers. The energy density range responsible for the creation of the out-of-plane magnetization was wider for the HT than for RT buffer. This is correlated with the higher (for HT crystalline quality and much smoother Pt/Co surface deduced from the X-ray diffraction studies. Submicrometer magnetic domains were observed in the irradiated region while approaching the out-of-plane magnetization state. Changes of Pt/Co/Pt structures are discussed for both types of light pulses.

  3. A chain of winking (oscillating) filaments triggered by an invisible extreme-ultraviolet wave

    Energy Technology Data Exchange (ETDEWEB)

    Shen, Yuandeng; Tian, Zhanjun; Zhao, Ruijuan [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Ichimoto, Kiyoshi; Ishii, Takako T.; Shibata, Kazunari, E-mail: ydshen@ynao.ac.cn [Kwasan and Hida Observatories, Kyoto University, Yamashina-ku, Kyoto 607-8471 (Japan)

    2014-05-10

    Winking (oscillating) filaments have been observed for many years. However, observations of successive winking filaments in one event have not yet been reported. In this paper, we present the observations of a chain of winking filaments and a subsequent jet that are observed right after the X2.1 flare in AR11283. The event also produced an extreme-ultraviolet (EUV) wave that has two components: an upward dome-like wave (850 km s{sup –1}) and a lateral surface wave (554 km s{sup –1}) that was very weak (or invisible) in imaging observations. By analyzing the temporal and spatial relationships between the oscillating filaments and the EUV waves, we propose that all the winking filaments and the jet were triggered by the weak (or invisible) lateral surface EUV wave. The oscillation of the filaments last for two or three cycles, and their periods, Doppler velocity amplitudes, and damping times are 11-22 minutes, 6-14 km s{sup –1}, and 25-60 minutes, respectively. We further estimate the radial component magnetic field and the maximum kinetic energy of the filaments, and they are 5-10 G and ∼10{sup 19} J, respectively. The estimated maximum kinetic energy is comparable to the minimum energy of ordinary EUV waves, suggesting that EUV waves can efficiently launch filament oscillations on their path. Based on our analysis results, we conclude that the EUV wave is a good agent for triggering and connecting successive but separated solar activities in the solar atmosphere, and it is also important for producing solar sympathetic eruptions.

  4. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    Science.gov (United States)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-01

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO2 laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  5. Influence of XUV radiation on Pv ionization fraction in hot star winds

    CERN Document Server

    Krticka, Jiri

    2012-01-01

    Different diagnostics of hot star wind mass-loss rates provide results that are difficult to reconcile with each other. The widely accepted presence of clumping in hot star winds implies a significant reduction of observational mass-loss rate estimates from diagnostics that depend on the square of the density. Moreover, the ultraviolet Pv resonance lines indicate a possible need for even stronger reduction of hot star mass-loss rates, provided that Pv is a dominant ionization stage of phosphorus at least in some hot stars. The latter assumption is challenged by a possible presence of the XUV radiation. Here we study the influence of the XUV radiation on the Pv ionization fraction in the hot star winds. By a detailed solution of the hydrodynamical, radiative transfer, and statistical equilibrium equations we confirm that sufficiently strong XUV radiation source may decrease the Pv ionization fraction, possibly depreciating the Pv lines as a reliable mass-loss rate indicator. On the other hand, the XUV radiatio...

  6. Optical technologies for extreme-ultraviolet and soft X-ray coherent sources

    CERN Document Server

    Poletto, Luca

    2015-01-01

    The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advance...

  7. Optical technologies for extreme-ultraviolet and soft X-ray coherent sources

    Energy Technology Data Exchange (ETDEWEB)

    Canova, Federico [Amplitude Technologies, Evry (France); Poletto, Luca (ed.) [National Research Council, Padova (Italy). Inst. of Photonics and Nanotechnology

    2015-07-01

    The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.

  8. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  9. Stress evolution in molybdenum/silicon multilayer mirrors for extreme ultraviolet lithography

    Science.gov (United States)

    Freitag, James Mac

    The continued shrinking of microelectronic device size necessitates advances in lithography, including possibly using extreme ultraviolet (EUV) light. The Mo/Si multilayer system is a promising candidate for reflective optics at a wavelength of roughly 135 A. However, these multilayers manifest high compressive stresses of approximately -350 MPa, which cause unacceptable distortion of the optical element. The goal of this project was to develop fundamental understanding of the origins of stress during growth of Mo/Si multilayers. A 40-bilayer structure deposited by DC-magnetron sputtering yielded a peak reflectivity of 65.7% at a wavelength of 136 A. We collected the stress data during deposition by in situ substrate curvature measurements using a multiple parallel laser beam technique. We measured large tensile and compressive curvature transients during initial growth of Mo on Si and Si on Mo. However, by sputtering with Kr rather than conventional Ar, it is possible to suppress the compressive transient upon Si deposition and thereby redress the compressive stress. Evidence implies that intermixing and alloying at the Mo-Si interfaces by asymmetric Si diffusion cause the transients. Indeed, Mo/Si multilayers sputtered with Kr exhibit less intermixing and high EUV reflectivity. However, the roughness of the multilayer may limit reflectivity and we therefore compare the roughness of Kr- and Ar-sputtered multilayers. Roughness, which leads to nonspecular scattering is problematic for EUV imaging systems because it decreases the useful throughput of a lithography system. We used x-ray diffraction to characterize the evolution of roughness with increasing number of bilayers in Mo/Si multilayers sputtered by Ar and Kr. By fitting a self-affine model of roughness to the diffuse spectra, we extracted the roughness and in-plane correlation lengths. We find that the lateral length scale of the roughness increases with the number of bilayers; however, the magnitude of the

  10. Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

    Science.gov (United States)

    Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

    2016-07-01

    Extreme ultraviolet lithography (EUVL, λ=13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high-power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity [S or best energy (BE)], and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (line width roughness, resolution and sensitivity trade-off) among these parameters for chemically amplified resists (CARs). We present early proof-of-principle results for a multiexposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a "Photosensitized Chemically Amplified Resist™" (PSCAR™). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV-flood exposure (λ=365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR, and EL high-performance requirements with the aim of resolving line space (L/S) features for the 7- and 5-nm logic node [16- and 13-nm half-pitch (HP), respectively] for HVM. Several CARs were additionally found to be well resolved down to 12- and 11-nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated

  11. Comparison of solar radio and extreme ultraviolet synoptic limb charts during the present solar maximum

    Science.gov (United States)

    Oliveira e Silva, A. J.; Selhorst, C. L.; Simões, P. J. A.; Giménez de Castro, C. G.

    2016-08-01

    Aims: The present solar cycle is particular in many aspects: it had a delayed rising phase, it is the weakest of the last 100 yrs, and it presents two peaks separated by more than one year. To understand the impact of these characteristics on the solar chromosphere and coronal dynamics, images from a wide wavelength range are needed. In this work we use the 17 GHz radio continuum, which is formed in the upper chromosphere and the extreme ultraviolet (EUV) lines 304 and 171 Å, that come from the transition region (He ii, T ~ 6-8 × 104 K) and the corona (Fe IX, X, T ~ 106 K), respectively.We extend upon a previous similar analysis, and compare the mean equatorial and polar brightening behavior at radio and EUV wavelengths during the maximum of the present solar cycle, covering the period between 2010 and 2015. Methods: We analyze daily images at 304 and 171 Å obtained by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The 17 GHz maps were obtained by the Nobeyama Radioheliograph (NoRH). To construct synoptic limb charts, we calculated the mean emission of delimited limb areas with 100'' wide and angular separation of 5°. Results: At the equatorial region, the results show a hemispheric asymmetry of the solar activity. The northern hemisphere dominance is coincident with the first sunspot number peak, whereas the second peak occurs concurrently with the increase in the activity at the south. The polar emission reflects the presence of coronal holes at both EUV wavelengths, moreover, the 17 GHz polar brightenings can be associated with the coronal holes. Until 2013, both EUV coronal holes and radio polar brightenings were more predominant at the south pole.Since then they have not been apparent in the north, but thus appear in the beginning of 2015 in the south as observed in the synoptic charts. Conclusions: This work strengthens the association between coronal holes and the 17 GHz polar brightenings as it is evident in the

  12. Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography

    Science.gov (United States)

    Cummins, Thomas

    The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviolet (EUV) photoemission around 13.5 nm, from laser produced tin (Sn) plasmas. EUV lithography has been identified as the leading next generation technology to take over from the current optical lithography systems, due to its potential of printing smaller feature sizes on integrated circuits. Many of the problems hindering the implementation of EUV lithography for high volume manufacturing have been overcome during the past 20 years of development. However, the lack of source power is a major concern for realising EUV lithography and remains a major roadblock that must be overcome. Therefore in order to optimise and improve the EUV emission from Sn laser plasma sources, many parameters contributing to the make-up of an EUV source are investigated. Chapter 3 presents the results of varying several different experimental parameters on the EUV emission from Sn laser plasmas. Several of the laser parameters including the energy, gas mixture, focusing lens position and angle of incidence are changed, while their effect on the EUV emission is studied. Double laser pulse experiments are also carried out by creating plasma targets for the main laser pulse to interact with. The resulting emission is compared to that of a single laser pulse on solid Sn. Chapter 4 investigates tailoring the CO2 laser pulse duration to improve the efficiency of an EUV source set-up. In doing so a new technique for shortening the time duration of the pulse is described. The direct effects of shortening the CO2 laser pulse duration on the EUV emission from Sn are then studied and shown to improve the efficiency of the source. In Chapter 5 a new plasma target type is studied and compared to the previous dual laser experiments. Laser produced colliding plasma jet targets form a new plasma layer, with densities that can be optimised for re-heating with the main CO2 laser pulse. Chapter 6 will present

  13. ZnO quantum dot-doped graphene/h-BN/GaN-heterostructure ultraviolet photodetector with extremely high responsivity

    Science.gov (United States)

    Lu, Yanghua; Wu, Zhiqian; Xu, Wenli; Lin, Shisheng

    2016-12-01

    A ZnO quantum dot photo-doped graphene/h-BN/GaN-heterostructure ultraviolet photodetector with extremely high responsivity of more than 1915 A W-1 and detectivity of more than 1.02 × 1013 Jones (Jones = cm Hz1/2 W-1) has been demonstrated. The interfaced h-BN layer increases the barrier height at the graphene/GaN heterojunction, which decreases the dark current and improves the on/off current ratio of the device. The photo-doping effect increases the barrier height and carrier concentration at the graphene/h-BN/GaN heterojunction, thus the responsivity is improved from 1473 A W-1 to 1915 A W-1 and the detectivity is improved from 5.8 × 1012 to 1.0 × 1013 Jones. Moreover, all of the responsivity and detectivity values are the highest values among all the graphene-based ultraviolet photodetectors.

  14. The Laser-assisted photoelectric effect of He, Ne, Ar and Xe in intense extreme ultraviolet and infrared laser fields

    Science.gov (United States)

    Hayden, P.; Dardis, J.; Hough, P.; Richardson, V.; Kennedy, E. T.; Costello, J. T.; Düsterer, S.; Redlin, H.; Feldhaus, J.; Li, W. B.; Cubaynes, D.; Meyer, M.

    2016-02-01

    In this paper, we report results on two-colour above-threshold ionisation, where extreme ultraviolet pulses of femtosecond duration were synchronised to intense infrared laser pulses of picosecond duration, in order to study the laser-assisted photoelectric effect of atomic helium, neon, krypton and xenon which leads to the appearance of characteristic sidebands in the photoelectron spectra. The observed trends are found to be well described by a simple model based on the soft-photon approximation, at least for the relatively low optical intensities of up to ? employed in these early experiments.

  15. Spectral-phase interferometry for direct electric-field reconstruction applied to seeded extreme-ultraviolet free-electron lasers

    CERN Document Server

    Mahieu, Benoît; De Ninno, Giovanni; Dacasa, Hugo; Lozano, Magali; Rousseau, Jean-Philippe; Zeitoun, Philippe; Garzella, David; Merdji, Hamed

    2015-01-01

    We present a setup for complete characterization of femtosecond pulses generated by seeded free-electron lasers (FEL's) in the extreme-ultraviolet spectral region. Two delayed and spectrally shifted replicas are produced and used for spectral phase interferometry for direct electric field reconstruction (SPIDER). We show that it can be achieved by a simple arrangement of the seed laser. Temporal shape and phase obtained in FEL simulations are well retrieved by the SPIDER reconstruction, allowing to foresee the implementation of this diagnostic on existing and future sources. This will be a significant step towards an experimental investigation and control of FEL spectral phase.

  16. Orbiting Retrievable Far and Extreme Ultraviolet Spectrometer - Shuttle Pallet Satellite (ORFEUS-SPAS)

    Science.gov (United States)

    1993-01-01

    The objective of the ORFEUS mission is to launch a deployable/retrievable astronomical platform and obtain ultraviolet spectra for both astrophysically interesting sources and the intervening interstellar medium. Also, the IMAX cameras will obtain footage of both the Shuttle and the ORFEUS-SPAS satellite during the deployment/retrieval operations phase of the ORFEUS-SPAS mission.

  17. Optical to extreme ultraviolet reddening curves for normal AGN dust and for dust associated with high-velocity outflows

    Science.gov (United States)

    Singh, Japneet; Gaskell, Martin; Gill, Jake

    2017-01-01

    We use mid-IR (WIRE), optical (SDSS), and ultraviolet (GALEX) photometry of over 80,000 AGNs to derive mean attenuation curves from the optical to the rest frame extreme ultraviolet (EUV) for (i) “normal” AGN dust dominating the optical reddening of AGNs and (ii) “BAL dust” - the dust causing the additional extinction in AGNs observed to have broad absorption lines (BALs). Our method confirms that the attenuation curve of “normal” AGN dust is flat in the ultraviolet, as found by Gaskell et al. (2004). In striking contrast to this, the attenuation curve for BAL dust is well fit by a steeply-rising, SMC-like curve. We confirm the shape of the theoretical Weingartner & Draine (2001) SMC curve out to 700 Angstroms but the drop in attenuation to still shorter wavelengths (400 Angstroms) seems to be less than predicted. We find identical attenuation curves for high-ionization and low-ionization BALQSOs. We suggest that attenuation curves appearing to be steeper than the SMC are due to differences in underlying spectra and partial covering by BAL dust. This work was This work was performed under the auspices of the Science Internship Program (SIP) of the University of California at Santa Cruz performed under the auspices of the Science Internship Program (SIP) of the University of California at Santa Cruz.

  18. Rocky Worlds Limited to ˜1.8 Earth Radii by Atmospheric Escape during a Star’s Extreme UV Saturation

    Science.gov (United States)

    Lehmer, Owen R.; Catling, David C.

    2017-08-01

    Recent observations and analysis of low-mass (planets only have radii up to 1.5-2 R ⊕. Two general hypotheses exist for the cause of the dichotomy between rocky and gas-enveloped planets (or possible water worlds): either low-mass planets do not necessarily form thick atmospheres of a few wt.%, or the thick atmospheres on these planets easily escape, driven by X-ray and extreme ultraviolet (XUV) emissions from young parent stars. Here, we show that a cutoff between rocky and gas-enveloped planets due to hydrodynamic escape is most likely to occur at a mean radius of 1.76 ± 0.38 (2σ) R ⊕ around Sun-like stars. We examine the limit in rocky planet radii predicted by hydrodynamic escape across a wide range of possible model inputs, using 10,000 parameter combinations drawn randomly from plausible parameter ranges. We find a cutoff between rocky and gas-enveloped planets that agrees with the observed cutoff. The large cross-section available for XUV absorption in the extremely distended primitive atmospheres of low-mass planets results in complete loss of atmospheres during the ˜100 Myr phase of stellar XUV saturation. In contrast, more-massive planets have less-distended atmospheres and less escape, and so retain thick atmospheres through XUV saturation—and then indefinitely as the XUV and escape fluxes drop over time. The agreement between our model and exoplanet data leads us to conclude that hydrodynamic escape plausibly explains the observed upper limit on rocky planet size and few planets (a “valley”, or “radius gap”) in the 1.5-2 R ⊕ range.

  19. Excitation of XUV radiation in solar flares

    Science.gov (United States)

    Emslie, A. Gordon

    1992-01-01

    The goal of the proposed research was to understand the means by which XUV radiation in solar flares is excited, and to use this radiation as diagnostics of the energy release and transport processes occurring in the flare. Significant progress in both of these areas, as described, was made.

  20. Analysis of unresolved transition arrays in XUV spectral region from highly charged lead ions produced by subnanosecond laser pulse

    Science.gov (United States)

    Wu, Tao; Higashiguchi, Takeshi; Li, Bowen; Arai, Goki; Hara, Hiroyuki; Kondo, Yoshiki; Miyazaki, Takanori; Dinh, Thanh-Hung; O'Reilly, Fergal; Sokell, Emma; O'Sullivan, Gerry

    2017-02-01

    Soft x-ray and extreme ultraviolet (XUV) spectra from lead (Pb, Z=82) laser-produced plasmas (LPPs) were measured in the 1.0-7.0 nm wavelength region employing a 150-ps, 1064-nm Nd:YAG laser with focused power densities in the range from 3.1×1013 W/cm2 to 1.4×1014 W/cm2. The flexible atomic code (FAC) and the Cowan's suite of atomic structure codes were applied to compute and explain the radiation properties of the lead spectra observed. The most prominent structure in the spectra is a broad double peak, which is produced by Δn=0, n=4-4 and Δn=1, n=4-5 transition arrays emitted from highly charged lead ions. The emission characteristics of Δn=1, n=4-5 transitions were investigated by the use of the unresolved transition arrays (UTAs) model. Numerous new spectral features generated by Δn=1, n=4-5 transitions in ions from Pb21+ to Pb45+ are discerned with the aid of the results from present computations as well as consideration of previous theoretical predictions and experimental data.

  1. Two-color above threshold ionization of atoms and ions in XUV Bessel beams and combined with intense laser light

    CERN Document Server

    Seipt, D; Surzhykov, A; Fritzsche, S

    2016-01-01

    The two-color above-threshold ionization (ATI) of atoms and ions is investigated for a vortex Bessel beam in the presence of a strong near-infrared (NIR) light field. While the photoionization is caused by the photons from the weak but extreme ultra-violet (XUV) vortex Bessel beam, the energy and angular distribution of the photoelectrons and their sideband structure are affected by the plane-wave NIR field. We here explore the energy spectra and angular emission of the photoelectrons in such two-color fields as a function of the size and location of the target (atoms) with regard to the beam axis. In addition, analogue to the circular dichroism in typical two-color ATI experiments with circularly polarized light, we define and discuss seven different dichroism signals for such vortex Bessel beams that arise from the various combinations of the orbital and spin angular momenta of the two light fields. For localized targets, it is found that these dichroism signals strongly depend on the size and position of t...

  2. Radiation hardness of AlxGa1-xN photodetectors exposed to Extreme UltraViolet (EUV) light beam

    Science.gov (United States)

    Malinowski, Pawel E.; John, Joachim; Barkusky, Frank; Duboz, Jean Yves; Lorenz, Anne; Cheng, Kai; Derluyn, Joff; Germain, Marianne; De Moor, Piet; Minoglou, Kyriaki; Bayer, Armin; Mann, Klaus; Hochedez, Jean-Francois; Giordanengo, Boris; Borghs, Gustaaf; Mertens, Robert

    2009-05-01

    We report on the results of fabrication and optoelectrical characterization of Gallium Nitride (GaN) based Extreme UltraViolet (EUV) photodetectors. Our devices were Schottky photodiodes with a finger-shaped rectifying contact, allowing better penetration of light into the active region. GaN layers were epitaxially grown on Silicon (111) by Metal- Organic-Chemical Vapor Deposition (MOCVD). Spectral responsivity measurements in the Near UltraViolet (NUV) wavelength range (200-400 nm) were performed to verify the solar blindness of the photodetectors. After that the devices were exposed to the EUV focused beam of 13.5 nm wavelength using table-top EUV setup. Radiation hardness was tested up to a dose of 3.3Â.1019 photons/cm2. Stability of the quantum efficiency was compared to the one measured in the same way for a commercially available silicon based photodiode. Superior behavior of GaN devices was observed at the wavelength of 13.5 nm.

  3. Extended-range grazing-incidence spectrometer for high-resolution extreme ultraviolet measurements on an electron beam ion trap

    Energy Technology Data Exchange (ETDEWEB)

    Beiersdorfer, P.; Magee, E. W.; Brown, G. V.; Träbert, E.; Widmann, K. [Lawrence Livermore National Laboratory, Livermore, California 94550 (United States); Hell, N. [Lawrence Livermore National Laboratory, Livermore, California 94550 (United States); Dr. Remeis-Sternwarte and ECAP, Universität Erlangen-Nürnberg, 96049 Bamberg (Germany)

    2014-11-15

    A high-resolution grazing-incidence grating spectrometer has been implemented on the Livermore electron beam ion traps for performing very high-resolution measurements in the soft x-ray and extreme ultraviolet region spanning from below 10 Å to above 300 Å. The instrument operates without an entrance slit and focuses the light emitted by highly charged ions located in the roughly 50 μm wide electron beam onto a cryogenically cooled back-illuminated charge-coupled device detector. The measured line widths are below 0.025 Å above 100 Å, and the resolving power appears to be limited by the source size and Doppler broadening of the trapped ions. Comparisons with spectra obtained with existing grating spectrometers show an order of magnitude improvement in spectral resolution.

  4. Improving attosecond pulse reflection by large angle incidence for a periodic multilayer mirror in the extreme ultraviolet region

    Institute of Scientific and Technical Information of China (English)

    Lin Cheng-You; Chen Shu-Jing; Liu Da-He

    2013-01-01

    The improvement of attosecond pulse reflection by large angle incidence for a periodic multilayer mirror in the extreme ultraviolet region has been discussed.Numerical simulations of both spectral and temporal reflection characteristics of periodic multilayer mirrors under various incident angles have been analyzed and compared.It was found that the periodic multilayer mirror under a larger incidence angle can provide not only higher integrated reflectivity but also a broader reflection band with negligible dispersion,making it possible to obtain better a reflected pulse that has a higher pulse reflection efficiency and shorter pulse duration for attosecond pulse reflection.In addition,by increasing the incident angle,the promotion of attosecond pulse reflection capability has been proven for periodic multilayer mirrors with arbitrary layers.

  5. Extreme ultraviolet solar irradiance during the rising phase of solar cycle 24 observed by PROBA2/LYRA

    Directory of Open Access Journals (Sweden)

    Zender Joe

    2012-08-01

    Full Text Available The Large-Yield Radiometer (LYRA is a radiometer that has monitored the solar irradiance at high cadence and in four pass bands since January 2010. Both the instrument and its spacecraft, PROBA2 (Project for OnBoard Autonomy, have several innovative features for space instrumentation, which makes the data reduction necessary to retrieve the long-term variations of solar irradiance more complex than for a fully optimized solar physics mission. In this paper, we describe how we compute the long-term time series of the two extreme ultraviolet irradiance channels of LYRA and compare the results with those of SDO/EVE. We find that the solar EUV irradiance has increased by a factor of 2 since the last solar minimum (between solar cycles 23 and 24, which agrees reasonably well with the EVE observations.

  6. Direct generation of intense extreme ultraviolet supercontinuum with chirped 11-mJ pulses from a femtosecond laser amplifier

    CERN Document Server

    Zeng, Bin; Li, Guihua; Yao, Jinping; Ni, Jielei; Zhang, Haisu; Cheng, Ya; Xu, Zhizhan

    2011-01-01

    We report on the generation of intense extreme ultraviolet (EUV) supercontinuum with photon energies spanning from 35 eV to 50 eV (i. e., supporting an isolated attosecond pulse with a duration of ~271 as) by loosely focusing 11-mJ chirped pulses from a femtosecond laser amplifier into a 10-mm long gas cell filled with krypton gas. We observe that when high-order harmonics are generated with transformed-limited ~35 fs pulses, only discrete harmonics can be produced; whereas for negatively chirped 188 fs pulses, EUV supercontinuum can be observed in single-shot harmonic spectrum. The dramatic change of spectral and temporal properties of the driver pulses after passing through the gas cell indicates that propagation effects play a significant role in promoting the generation of the EUV supercontinuum.

  7. X-Ray and Extreme Ultraviolet Emission from Small-Sized Kr Clusters Irradiated by 150-fs Laser Pulses

    Institute of Scientific and Technical Information of China (English)

    王骐; 程元丽; 赵永蓬; 夏元钦; 陈建新; 肖亦凡

    2003-01-01

    x-ray and extreme ultraviolet (EUV) emission from Kr clusters irradiated by 150-fs laser pulses at the peak laser intensity of 5×1015W/cm2 was experimentally investigated. Strong transitions (10nm-13nm) from Kr X and Kr 1X were observed and some spectral lines from Kr ⅩⅢ and Kr ⅩⅣ, which have been predicted to be not produced by optical-field-ionization at the laser intensity used, also appeared. The laser energy absorption and the intensity of x-ray emission started to grow remarkably above the backing pressure of 0.5 MPa and to decrease at the backing pressure of 3 MPa. It is suggested that an optimum backing pressure may exist for Kr clusters heated by 150 fs laser pulses at a certain laser intensity to produce x-ray emission.

  8. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

    Energy Technology Data Exchange (ETDEWEB)

    Soufli, R; Hudyma, R M; Spiller, E; Gullikson, E M; Schmidt, M A; Robinson, J C; Baker, S L; Walton, C C; Taylor, J S

    2007-01-03

    This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.

  9. The Extreme Ultraviolet Spectrograph Sounding Rocket Payload: Recent Modifications for Planetary Observations in the EUV/FUV

    Science.gov (United States)

    Slater, David C.; Stern, S. Alan; Scherrer, John; Cash, Webster; Green, James C.; Wilkinson, Erik

    1995-01-01

    We report on the status of modifications to an existing extreme ultraviolet (EUV) telescope/spectrograph sounding rocket payload for planetary observations in the 800 - 1200 A wavelength band. The instrument is composed of an existing Wolter Type 2 grazing incidence telescope, a newly built 0.4-m normal incidence Rowland Circle spectrograph, and an open-structure resistive-anode microchannel plate detector. The modified payload has successfully completed three NASA sounding rocket flights within 1994-1995. Future flights are anticipated for additional studies of planetary and cometary atmospheres and interstellar absorption. A detailed description of the payload, along with the performance characteristics of the integrated instrument are presented. In addition, some preliminary flight results from the above three missions are also presented.

  10. Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography

    Directory of Open Access Journals (Sweden)

    Tomoko Gowa Oyama

    2011-12-01

    Full Text Available At and below the 11 nm node, shortening the exposure wavelength to >10 nm (extreme ultraviolet (EUV/soft x-ray region, especially at 6.6-6.8 nm, has been discussed as next-generation EUV lithography. In this study, dose/sensitivities of typical resists were obtained at several wavelengths down to 3.1 nm and were found to depend on the wavelength. However, it was confirmed that the absorbed dose, calculated from the dose/sensitivity and the respective linear absorption coefficient, was almost independent of the wavelength and constant for each resist. Thus, the resist sensitivity for next-generation lithography was predicted at wavelengths <10 nm.

  11. Highly sensitive visible-blind extreme ultraviolet Ni/4H-SiC Schottky photodiodes with large detection area.

    Science.gov (United States)

    Hu, Jun; Xin, Xiaobin; Zhao, Jian H; Yan, Feng; Guan, Bing; Seely, John; Kjornrattanawanich, Benjawan

    2006-06-01

    Ni/4H-SiC Schottky photodiodes of 5 mm x 5 mm area have been fabricated and characterized. The photodiodes show less than 0.1 pA dark current at -4 V and an ideality factor of 1.06. A quantum efficiency (QE) between 3 and 400 nm has been calibrated and compared with Si photodiodes optimized for extreme ultraviolet (EUV) detection. In the EUV region, the QE of SiC detectors increases from 0.14 electrons/photon at 120 nm to 30 electrons/photon at 3 nm. The mean energy of electron-hole pair generation of 4H-SiC estimated from the spectral QE is found to be 7.9 eV.

  12. Generation of bright circularly-polarized extreme ultraviolet high harmonics for magnetic circular dichroism spectroscopy

    CERN Document Server

    Kfir, Ofer; Turgut, Emrah; Knut, Ronny; Zusin, Dmitriy; Popmintchev, Dimitar; Popmintchev, Tenio; Nembach, Hans; Shaw, Justin M; Fleicher, Avner; Kapteyn, Henry; Murnane, Margaret; Cohen, Oren

    2014-01-01

    Circularly-polarized extreme UV and X-ray radiation provides valuable access to the structural, electronic and magnetic properties of materials. To date, such experiments have been possible only using large-scale free-electron lasers or synchrotrons. Here we demonstrate the first bright extreme UV circularly-polarized high harmonics and use this new light source for magnetic circular dichroism measurements at the M-shell absorption edges of cobalt. This work paves the way towards element-specific imaging and spectroscopy of multiple elements simultaneously in magnetic and other chiral media with very high spatio-temporal resolution, all on a tabletop.

  13. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas.

    Science.gov (United States)

    Musgrave, Christopher S A; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

    2017-03-01

    With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 10(10) and 10(11) W/cm(2)) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

  14. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

    Science.gov (United States)

    Musgrave, Christopher S. A.; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

    2017-03-01

    With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

  15. Plasma wake field XUV radiation source

    Energy Technology Data Exchange (ETDEWEB)

    Prono, Daniel S. (Los Alamos, NM); Jones, Michael E. (Los Alamos, NM)

    1997-01-01

    A XUV radiation source uses an interaction of electron beam pulses with a gas to create a plasma radiator. A flowing gas system (10) defines a circulation loop (12) with a device (14), such as a high pressure pump or the like, for circulating the gas. A nozzle or jet (16) produces a sonic atmospheric pressure flow and increases the density of the gas for interacting with an electron beam. An electron beam is formed by a conventional radio frequency (rf) accelerator (26) and electron pulses are conventionally formed by a beam buncher (28). The rf energy is thus converted to electron beam energy, the beam energy is used to create and then thermalize an atmospheric density flowing gas to a fully ionized plasma by interaction of beam pulses with the plasma wake field, and the energetic plasma then loses energy by line radiation at XUV wavelengths Collection and focusing optics (18) are used to collect XUV radiation emitted as line radiation when the high energy density plasma loses energy that was transferred from the electron beam pulses to the plasma.

  16. Initial Results from the XUV Doppler Telescope

    Science.gov (United States)

    Kano, R.; Hara, H.; Kobayashi, K.; Kumagai, K.; Nagata, S.; Sakao, T.; Shimizu, T.; Tsuneta, S.; Yoshida, T.

    We developed a unique telescope to obtain simultaneous XUV images and the velocity maps by measuring the line-of-sight Doppler shifts of the Fe XIV 211A&ring line (T = 1.8 MK): the Solar XUV Doppler Telescope (hereafter XDT). The telescope was launched by the Institute of Space and Astronautical Science with the 22nd S520 rocket on January 31, 1998, and took 14 XUV whole sun images during 5 minutes. Simultaneous observations of XDT with Yohkoh (SXT), SOHO (EIT, CDS, LASCO and MDI) were successfully carried out. The images taken with EIT, XDT and SXT are able to cover the wide temperature ranging from 1 to 10 MK, and clearly show the multi-temperature nature of the solar corona. Indeed, we notice that both the cool (1-2 MK) loops observed with EIT and XDT, and the hot (>3 MK) loops observed with SXT exist in the same active regions but in a spatially exclusive way. The XDT red-blue ratio between longer- and shorter-wavelength bands of Fe XIV 211A&ring line indicates a possible down-flow of 1.8 MK plasma near the footpoints of multiple cool loops

  17. An extreme ultraviolet excess in the superluminous supernova Gaia16apd reveals a powerful central engine

    CERN Document Server

    Nicholl, M; Margutti, R; Blanchard, P K; Milisavljevic, D; Challis, P; Metzger, B D; Chornock, R

    2016-01-01

    Since the discovery of superluminous supernovae (SLSNe) in the last decade, it has been known that these events exhibit bluer spectral energy distributions than other supernova subtypes, with significant output in the ultraviolet. However, the event Gaia16apd seems to outshine even the other SLSNe at rest-frame wavelengths below $\\sim 3000$ \\AA. Yan et al (2016) have recently presented HST UV spectra and attributed the UV flux to low metallicity and hence reduced line blanketing. Here we present UV and optical light curves over a longer baseline in time, revealing a rapid decline at UV wavelengths despite a typical optical evolution. Combining the published UV spectra with our own optical data, we demonstrate that Gaia16apd has a much hotter continuum than virtually any SLSN at maximum light, but it cools rapidly thereafter and is indistinguishable from the others by $\\sim 10$-15 days after peak. Comparing the equivalent widths of UV absorption lines with those of other events, we show that the excess UV cont...

  18. The MUSCLES Treasury Survey II: Intrinsic Lyman Alpha and Extreme Ultraviolet Spectra of K and M Dwarfs with Exoplanets

    CERN Document Server

    Youngblood, Allison; Loyd, R O Parke; Linsky, Jeffrey L; Redfield, Seth; Schneider, P Christian; Wood, Brian E; Brown, Alexander; Froning, Cynthia; Miguel, Yamila; Rugheimer, Sarah; Walkowicz, Lucianne

    2016-01-01

    The ultraviolet (UV) spectral energy distributions of low-mass (K- and M-type) stars play a critical role in the heating and chemistry of exoplanet atmospheres, but are not observationally well-constrained. Direct observations of the intrinsic flux of the Lyman alpha line (the dominant source of UV photons from low-mass stars) are challenging, as interstellar HI absorbs the entire line core for even the closest stars. To address the existing gap in empirical constraints on the UV flux of K and M dwarfs, the MUSCLES HST Treasury Survey has obtained UV observations of 11 nearby M and K dwarfs hosting exoplanets. This paper presents the Lyman alpha and extreme-UV spectral reconstructions for the MUSCLES targets. Most targets are optically inactive, but all exhibit significant UV activity. We use a Markov Chain Monte Carlo technique to correct the observed Lyman alpha profiles for interstellar absorption, and we employ empirical relations to compute the extreme-UV spectral energy distribution from the intrinsic L...

  19. Two-colour pump–probe experiments with a twin-pulse-seed extreme ultraviolet free-electron laser

    Science.gov (United States)

    Allaria, E.; Bencivenga, F.; Borghes, R.; Capotondi, F.; Castronovo, D.; Charalambous, P.; Cinquegrana, P.; Danailov, M. B.; De Ninno, G.; Demidovich, A.; Di Mitri, S.; Diviacco, B.; Fausti, D.; Fawley, W. M.; Ferrari, E.; Froehlich, L.; Gauthier, D.; Gessini, A.; Giannessi, L.; Ivanov, R.; Kiskinova, M.; Kurdi, G.; Mahieu, B.; Mahne, N.; Nikolov, I.; Masciovecchio, C.; Pedersoli, E.; Penco, G.; Raimondi, L.; Serpico, C.; Sigalotti, P.; Spampinati, S.; Spezzani, C.; Svetina, C.; Trovò, M.; Zangrando, M.

    2013-01-01

    Exploring the dynamics of matter driven to extreme non-equilibrium states by an intense ultrashort X-ray pulse is becoming reality, thanks to the advent of free-electron laser technology that allows development of different schemes for probing the response at variable time delay with a second pulse. Here we report the generation of two-colour extreme ultraviolet pulses of controlled wavelengths, intensity and timing by seeding of high-gain harmonic generation free-electron laser with multiple independent laser pulses. The potential of this new scheme is demonstrated by the time evolution of a titanium-grating diffraction pattern, tuning the two coherent pulses to the titanium M-resonance and varying their intensities. This reveals that an intense pulse induces abrupt pattern changes on a time scale shorter than hydrodynamic expansion and ablation. This result exemplifies the essential capabilities of the jitter-free multiple-colour free-electron laser pulse sequences to study evolving states of matter with element sensitivity. PMID:24048228

  20. Two-colour pump-probe experiments with a twin-pulse-seed extreme ultraviolet free-electron laser.

    Science.gov (United States)

    Allaria, E; Bencivenga, F; Borghes, R; Capotondi, F; Castronovo, D; Charalambous, P; Cinquegrana, P; Danailov, M B; De Ninno, G; Demidovich, A; Di Mitri, S; Diviacco, B; Fausti, D; Fawley, W M; Ferrari, E; Froehlich, L; Gauthier, D; Gessini, A; Giannessi, L; Ivanov, R; Kiskinova, M; Kurdi, G; Mahieu, B; Mahne, N; Nikolov, I; Masciovecchio, C; Pedersoli, E; Penco, G; Raimondi, L; Serpico, C; Sigalotti, P; Spampinati, S; Spezzani, C; Svetina, C; Trovò, M; Zangrando, M

    2013-01-01

    Exploring the dynamics of matter driven to extreme non-equilibrium states by an intense ultrashort X-ray pulse is becoming reality, thanks to the advent of free-electron laser technology that allows development of different schemes for probing the response at variable time delay with a second pulse. Here we report the generation of two-colour extreme ultraviolet pulses of controlled wavelengths, intensity and timing by seeding of high-gain harmonic generation free-electron laser with multiple independent laser pulses. The potential of this new scheme is demonstrated by the time evolution of a titanium-grating diffraction pattern, tuning the two coherent pulses to the titanium M-resonance and varying their intensities. This reveals that an intense pulse induces abrupt pattern changes on a time scale shorter than hydrodynamic expansion and ablation. This result exemplifies the essential capabilities of the jitter-free multiple-colour free-electron laser pulse sequences to study evolving states of matter with element sensitivity.

  1. A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography

    NARCIS (Netherlands)

    Wieggers, R. C.; W. J. Goedheer,; M.R. Akdim,; F. Bijkerk,; Zegeling, P. A.

    2008-01-01

    We present a kinetic simulation of the plasma formed by photoionization in the intense flux of an extreme ultraviolet lithography (EUVL) light source. The model is based on the particle-in-cell plus Monte Carlo approach. The photoelectric effect and ionization by electron collisions are included. Th

  2. Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

    NARCIS (Netherlands)

    Mund, Baibhav Kumar; Sturm, J.M.; Lee, Christopher James; Bijkerk, Frederik

    2018-01-01

    In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 ML) and exposed to EUV (λ = 13.5 nm, 92 eV) with

  3. First results of measurements of extreme ultraviolet radiation onboard a geostationary satellite "ELECTRO-L"

    Science.gov (United States)

    Nusinov, Anatoliy; Kazachevskaya, Tamara; Gonjukh, David

    Measurements of the intensity of EUV emission in the hydrogen Lyman-alpha line were conducted by a broadband photometer VUSS-E onboard geostationary Hydrometeorological satellite "Electro" since March 2011. The solar hydrogen Lyman-alpha line (lambda = 121.6 nm) was monitored. The photomultiplier with LiF window used as a detector insensitive to visible light. Long-wavelength limit of the spectral band sensitivity of the instrument is about 200 nm, so the signal of the device is defined as the flux of solar radiation in the region of 123-200 nm. Its exclusion was carried out by calculation. Since the satellite "Electro" designed for remote sensing of the Earth, its line of sight focused on Earth. Alignment of instrument in the Sun direction was achieved by installing it on the solar panel, periodically moved in the solar direction. Correction of instrument readings, reduced due to the deviation of its axis from the Sun direction, carried out by calculation. Measurements were carried out every second. The first results of the measurements are presented. The difference in absolute calibration Electro-L/VUSS-E is within 5% of corresponding values for measurements TIMED satellite in those days, that is in agreement with laboratory calibrations. It is useful to measure the temperature of the instrument, as its variation on a small interval of time makes change the value of the output signal about 1-2 %. During first year of operation, the sensitivity of the apparatus remained within ± 2% of measured value, significant degradation of sensitivity was not observed. Over time of observation there have been several large flares of X class. The increase of the signal in the ultraviolet range does not exceed a few percent during these flares.

  4. Vacuum ultraviolet instrumentation for solar irradiance and thermospheric airglow

    Science.gov (United States)

    Woods, Thomas N.; Rottman, Gary J.; Bailey, Scott M.; Solomon, Stanley C.

    1993-01-01

    A NASA sounding rocket experiment was developed to study the solar extreme ultraviolet (EUV) spectral irradiance and its effect on the upper atmosphere. Both the solar flux and the terrestrial molecular nitrogen via the Lyman-Birge-Hopfield bands in the far ultraviolet (FUV) were measured remotely from a sounding rocket on October 27, 1992. The rocket experiment also includes EUV instruments from Boston University (Supriya Chakrabarti), but only the National Center for Atmospheric Research (NCAR)/University of Colorado (CU) four solar instruments and one airglow instrument are discussed here. The primary solar EUV instrument is a 1/4 meter Rowland circle EUV spectrograph which has flown on three rockets since 1988 measuring the solar spectral irradiance from 30 to 110 nm with 0.2 nm resolution. Another solar irradiance instrument is an array of six silicon XUV photodiodes, each having different metallic filters coated directly on the photodiodes. This photodiode system provides a spectral coverage from 0.1 to 80 nm with about 15 nm resolution. The other solar irradiance instrument is a silicon avalanche photodiode coupled with pulse height analyzer electronics. This avalanche photodiode package measures the XUV photon energy providing a solar spectrum from 50 to 12,400 eV (25 to 0.1 nm) with an energy resolution of about 50 eV. The fourth solar instrument is an XUV imager that images the sun at 17.5 nm with a spatial resolution of 20 arc-seconds. The airglow spectrograph measures the terrestrial FUV airglow emissions along the horizon from 125 to 160 nm with 0.2 nm spectral resolution. The photon-counting CODACON detectors are used for three of these instruments and consist of coded arrays of anodes behind microchannel plates. The one-dimensional and two-dimensional CODACON detectors were developed at CU by Dr. George Lawrence. The pre-flight and post-flight photometric calibrations were performed at our calibration laboratory and at the Synchrotron Ultraviolet

  5. An extreme ultraviolet Michelson interferometer for experiments at free-electron lasers.

    Science.gov (United States)

    Hilbert, Vinzenz; Blinne, Alexander; Fuchs, Silvio; Feigl, Torsten; Kämpfer, Tino; Rödel, Christian; Uschmann, Ingo; Wünsche, Martin; Paulus, Gerhard G; Förster, Eckhart; Zastrau, Ulf

    2013-09-01

    We present a Michelson interferometer for 13.5 nm soft x-ray radiation. It is characterized in a proof-of-principle experiment using synchrotron radiation, where the temporal coherence is measured to be 13 fs. The curvature of the thin-film beam splitter membrane is derived from the observed fringe pattern. The applicability of this Michelson interferometer at intense free-electron lasers is investigated, particularly with respect to radiation damage. This study highlights the potential role of such Michelson interferometers in solid density plasma investigations using, for instance, extreme soft x-ray free-electron lasers. A setup using the Michelson interferometer for pseudo-Nomarski-interferometry is proposed.

  6. An extreme ultraviolet Michelson interferometer for experiments at free-electron lasers

    Energy Technology Data Exchange (ETDEWEB)

    Hilbert, Vinzenz; Fuchs, Silvio; Paulus, Gerhard G.; Zastrau, Ulf [Institute of Optics and Quantum Electronics, Friedrich-Schiller University Jena, Max-Wien-Platz 1, 07743 Jena (Germany); Blinne, Alexander [Institute for Theoretical Physics, Friedrich-Schiller University Jena, Max-Wien-Platz 1, 07743 Jena (Germany); Feigl, Torsten [Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Straße 7, 07745 Jena (Germany); Kämpfer, Tino; Rödel, Christian; Uschmann, Ingo; Wünsche, Martin; Förster, Eckhart [Institute of Optics and Quantum Electronics, Friedrich-Schiller University Jena, Max-Wien-Platz 1, 07743 Jena (Germany); Helmholtz Institute, Fröbelstieg 3, 07743 Jena (Germany)

    2013-09-15

    We present a Michelson interferometer for 13.5 nm soft x-ray radiation. It is characterized in a proof-of-principle experiment using synchrotron radiation, where the temporal coherence is measured to be 13 fs. The curvature of the thin-film beam splitter membrane is derived from the observed fringe pattern. The applicability of this Michelson interferometer at intense free-electron lasers is investigated, particularly with respect to radiation damage. This study highlights the potential role of such Michelson interferometers in solid density plasma investigations using, for instance, extreme soft x-ray free-electron lasers. A setup using the Michelson interferometer for pseudo-Nomarski-interferometry is proposed.

  7. Segmentation of extreme ultraviolet (SOHO) Sun images by means of watershed and region merging

    Science.gov (United States)

    Nieniewski, Mariusz

    2002-06-01

    The paper presents a new method of segmentation of Extreme UV images, which is based on the use of the watershed algoritm. The result of the watershed takes form of a partition of the whole image into a large number of segments. Some of these segments are then merged into larger regions representing meaningful objects, such as coronal holes. The proposed method of region merging finds the maximum of the average contrast between the current region and its boundary defined as a collection of watershed segments coming to touch with this region. The maximization of the average contrast gives the results which are in agreement with human intuition. Furthermore, this approach allows one to conduct the segmentation of the sun images almost independently of any tuning parameters. Tests of the method on such images taken at various levels of sun's activity showed that the method can be used independently of the local brightness level and the extent of the coronal holes.

  8. Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials

    Science.gov (United States)

    Rangan, Sylvie; Bartynski, Robert A.; Narasimhan, Amrit; Brainard, Robert L.

    2017-07-01

    The electronic structure of extreme ultra violet resist materials and of their individual components, two polymers and two photoacid generators (PAGs), is studied using a combination of x-ray and UV photoemission spectroscopies, electron energy loss spectroscopy, and ab-initio techniques. It is shown that simple molecular models can be used to understand the electronic structure of each sample and describe the experimental data. Additionally, effects directly relevant to the photochemical processes are observed: low energy loss processes are observed for the phenolic polymer containing samples that should favor thermalization of electrons; PAG segregation is measured at the surface of the resist films that could lead to surface inhomogeneities; both PAGs are found to be stable upon irradiation in the absence of the polymer, contrasting with a high reactivity that can be followed upon x-ray irradiation of the full resist.

  9. Ablation of various materials with intense XUV radiation

    Energy Technology Data Exchange (ETDEWEB)

    Juha, Libor E-mail: juha@fzu.cz; Krasa, Josef; Cejnarova, Andrea; Chvostova, Dagmar; Vorlicek, V.; Krzywinski, Jacek; Sobierajski, Ryszard; Andrejczuk, Andrzej; Jurek, Marek; Klinger, Dorota; Fiedorowicz, Henryk; Bartnik, Andrzej; Pfeifer, Miroslav; Kubat, Pavel; Pina, Ladislav; Kravarik, Jozef; Kubes, Pavel; Bakshaev, Y.L.; Korolev, V.D.; Chernenko, A.S.; Ivanov, M.I.; Scholz, Marek; Ryc, Leszek; Feldhaus, Josef; Ullschmied, Jiri; Boody, F.P

    2003-07-11

    Ablation behavior of organic polymer (polymethylmethacrylate) and elemental solid (silicon) irradiated by single pulses of XUV radiation emitted from Z-pinch, plasma-focus, and laser-produced plasmas was investigated. The ablation characteristics measured for these plasma-based sources will be compared with those obtained for irradiation of samples with XUV radiation generated by a free-electron laser.

  10. Investigating the Effects of Simulated Martian Ultraviolet Radiation on Halococcus dombrowskii and Other Extremely Halophilic Archaebacteria

    Science.gov (United States)

    Fendrihan, Sergiu; Bérces, Attila; Lammer, Helmut; Musso, Maurizio; Rontó, György; Polacsek, Tatjana K.; Holzinger, Anita; Kolb, Christoph; Stan-Lotter, Helga

    2009-02-01

    The isolation of viable extremely halophilic archaea from 250-million-year-old rock salt suggests the possibility of their long-term survival under desiccation. Since halite has been found on Mars and in meteorites, haloarchaeal survival of martian surface conditions is being explored. Halococcus dombrowskii H4 DSM 14522T was exposed to UV doses over a wavelength range of 200-400 nm to simulate martian UV flux. Cells embedded in a thin layer of laboratory-grown halite were found to accumulate preferentially within fluid inclusions. Survival was assessed by staining with the LIVE/DEAD kit dyes, determining colony-forming units, and using growth tests. Halite-embedded cells showed no loss of viability after exposure to about 21 kJ/m2, and they resumed growth in liquid medium with lag phases of 12 days or more after exposure up to 148 kJ/m2. The estimated D37 (dose of 37% survival) for Hcc. dombrowskii was ≥ 400 kJ/m2. However, exposure of cells to UV flux while in liquid culture reduced D37 by 2 orders of magnitude (to about 1 kJ/m2); similar results were obtained with Halobacterium salinarum NRC-1 and Haloarcula japonica. The absorption of incoming light of shorter wavelength by color centers resulting from defects in the halite crystal structure likely contributed to these results. Under natural conditions, haloarchaeal cells become embedded in salt upon evaporation; therefore, dispersal of potential microscopic life within small crystals, perhaps in dust, on the surface of Mars could resist damage by UV radiation.

  11. Soft X-ray irradiance measured by the Solar Aspect Monitor on the Solar Dynamic Observatory Extreme ultraviolet Variability Experiment

    CERN Document Server

    Lin, C Y; Jones, A; Woodraska, D; Caspi, A; Woods, T N; Eparvier, F G; Wieman, S R; Didkovsky, L V

    2016-01-01

    The Solar Aspect Monitor (SAM) is a pinhole camera on the Extreme-ultraviolet Variability Experiment (EVE) aboard the Solar Dynamics Observatory (SDO). SAM projects the solar disk onto the CCD through a metallic filter designed to allow only solar photons shortward of 7 nm to pass. Contamination from energetic particles and out-of-band irradiance is, however, significant in the SAM observations. We present a technique for isolating the 0.01--7 nm integrated irradiance from the SAM signal to produce the first results of broadband irradiance for the time period from May 2010 to May 2014. The results of this analysis agree with a similar data product from EVE's EUV SpectroPhotometer (ESP) to within 25%. We compare our results with measurements from the Student Nitric Oxide Explorer (SNOE) Solar X-ray Photometer (SXP) and the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED) Solar EUV Experiment (SEE) at similar levels of solar activity. We show that the full-disk SAM broadband results compare we...

  12. Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

    Science.gov (United States)

    Iida, Susumu; Amano, Tsuyoshi; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro

    2013-04-01

    According to an International Technology Roadmap for Semiconductors (ITRS-2012) update, the sensitivity requirement for an extreme ultraviolet (EUV) mask pattern inspection system is to be less than 18 nm for half pitch (hp) 16-nm node devices. The inspection sensitivity of extrusion and intrusion defects on hp 64-nm line-and-space patterned EUV mask were investigated using simulated projection electron microscope (PEM) images. The obtained defect images showed that the optimization of current density and image processing techniques were essential for the detection of defects. Extrusion and intrusion defects 16 nm in size were detected on images formed by 3000 electrons per pixel. The landing energy also greatly influenced the defect detection efficiency. These influences were different for extrusion and intrusion defects. These results were in good agreement with experimentally obtained yield curves of the mask materials and the elevation angles of the defects. These results suggest that the PEM technique has a potential to detect 16-nm size defects on an hp 64-nm patterned EUV mask.

  13. Efficient method for the determination of extreme-ultraviolet optical constants in reactive materials: application to scandium and titanium.

    Science.gov (United States)

    Uspenskii, Yu A; Seely, John E; Popov, N L; Vinogradov, A V; Pershin, Yu P; Kondratenko, V V

    2004-02-01

    The chemical reaction of a sample with atmospheric gases causes a significant error in the determinantion of the complex refractive index n = 1 - delta + ibeta in the extreme-ultraviolet region. The protection of samples removes this effect but hampers the interpretation of measurements. To overcome this difficulty, we derive the exact dependences on film thickness of the reflectivity and transmissivity of a protected film. These dependences greatly simplify the determination of delta and beta when the spectra of several films with different thickness and identical protection are measured. They also allow the verification of the delta(omega) obtained from the Kramers-Kronig relation and even make the Kramers-Kronig method unnecessary in many cases. As a practical application, the optical constants of Sc and Ti are determined at h omega = 18-70 eV and 18-99 eV, respectively. The essential feature of our experimental technique is deposition of a film sample directly on a silicon photodiode that allows easy operation with both thin (approximately 10-nm) and thick (approximately 100-nm) films. The comparison of calculated reflectivities of Si-Sc multilayers with the measured values shows the high accuracy of the determined delta(omega) and beta(omega).

  14. Theoretical study of relationships among resolution, line width roughness, and sensitivity of chemically amplified extreme ultraviolet resists with photodecomposable quenchers

    Science.gov (United States)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2016-11-01

    The resolution of chemically amplified extreme ultraviolet (EUV) resists has reached 13-15 nm. However, the line width roughness (LWR) and sensitivity are still inadequate for their application to the high-volume production of semiconductor devices. In this study, the performance of chemically amplified resists with photodecomposable quenchers were investigated by simulation based on the sensitization and reaction mechanisms of chemically amplified EUV resists. The relationships among resolution, LWR, and sensitivity were evaluated in the half-pitch ranges of 12-16 nm. The requirements for 20 mJ cm-2 and 10% critical dimension (CD) LWR are considered to be within the physical limits in the half-pitch range of 12-16 nm when an optical image with a contrast of 1 (normalized image log slope of π) is given. Depending on the given image quality and the required sensitivity, the optimization of sensitizer concentration and the increase in resist absorption coefficient and/or effective reaction radius for deprotection are required to achieve 10% CD LWR.

  15. Performance optimisation of a neon DBD excimer light source operating in the extreme-ultraviolet (84nm)

    Science.gov (United States)

    Carman, Robert; Ward, B. K.; Kane, D. M.

    2009-10-01

    We have investigated the electrical and optical characteristics of a windowless dielectric barrier discharge (DBD) excimer lamp using Neon to generate output at ˜84nm in the extreme-ultraviolet (EUV) spectral range. A detailed comparison of Ne DBD lamp performance for both pulsed and sinusoidal voltage excitation waveforms has been undertaken using otherwise identical operating conditions. Compared to sinusoidal excitation, pulsed operation yields a ˜50% increase in the overall electrical to EUV conversion efficiency, and also allows greater control of parameters associated with the temporal evolution of the EUV pulse shapes (risetime, peak power, pulse width) due to a synchronised breakdown of the discharge gap along the electrode length. The ability to tailor EUV pulse shapes is important for applications in materials processing and surface cleaning. The source is also found to be highly monochromatic with respect to its spectral output at ˜84nm which dominates the spectral emission over the wavelength range 30-550nm. The overall lamp performance, as measured by the EUV output power, electrical to EUV conversion efficiency, and spectral purity at ˜84nm, improves with increasing gas pressure up to 900mb with none of these parameters showing saturation characteristics.

  16. The influence of the Extreme Ultraviolet spectral energy distribution on the structure and composition of the upper atmosphere of exoplanets

    CERN Document Server

    Guo, J H

    2015-01-01

    By varying the profiles of stellar extreme ultraviolet (EUV) spectral energy distribution (SED), we tested the influences of stellar EUV SEDs on the physical and chemical properties of the escaping atmosphere. We apply our model to study four exoplanets, HD\\,189733b, HD\\,209458b, GJ \\,436b, and Kepler-11b. We found that the total mass loss rates of an exoplanet, which are determined mainly by the integrated fluxes, are moderately affected by the profiles of the EUV SED, but the composition and species distributions in the atmosphere can be dramatically modified by the different profiles of the EUV SED. For exoplanets with a high hydrodynamic escape parameter ($\\lambda$), the amount of atomic hydrogen produced by photoionization at different altitudes can vary by one to two orders of magnitude with the variation of stellar EUV SEDs. The effect of photoionization of H is prominent when the EUV SED is dominated by the low-energy spectral region (400-900${\\AA}$), which pushes the transition of H/H$^{+}$ to low al...

  17. Influence of the electrode wear on the EUV generation of a discharge based extreme ultraviolet light source

    Science.gov (United States)

    Vieker, Jochen; Bergmann, Klaus

    2017-08-01

    Reliability and a long maintenance interval are major requirements for the industrial use of an extreme ultraviolet (EUV) source. In this paper we present results on the influence of the electrode erosion on the EUV generation and its lifetime limiting characteristics. The geometry of the electrodes and their influence on the gas pressure distribution within the electrode system have been found to be the key variables to characterize the regime of operation. This better understanding allows for an optimization of device parameters (e.g. gas flow or pulse energy) to counteract the erosion process, in order to increase the maintenance interval and EUV output. The EUV source under investigation is based on a hollow cathode triggered pinch plasma. A new trigger concept is introduced that enables free adjustment of the gas pressure during operation, thus enabling the operation with a high conversion efficiency of up to  >0.7 %/2πsr at 13.5 nm and 2% bandwidth. The efficiency for the peak brilliance is up to ~2.6 W kW-1 mm-2sr-1 while the maximum electrical input power of the system is 15 kW.

  18. All About EVE: Education and Public Outreach for the Extreme Ultraviolet Variability Experiment (EVE) of the NASA Solar Dynamic Observatory

    Science.gov (United States)

    Eparvier, F. G.; McCaffrey, M. S.; Buhr, S. M.

    2008-12-01

    With the aim of meeting NASA goals for education and public outreach as well as support education reform efforts including the National Science Education Standards, a suite of education materials and strategies have been developed by the Cooperative Institute for Environmental Sciences (CIRES) with the Laboratory for Atmospheric and Space Physics (LASP) at the University of Colorado for the Extreme Ultraviolet Variability Experiment (EVE), which is an instrument aboard the Solar Dynamic Observatory. This paper will examine the education materials that have been developed for teachers in the classroom and scientists who are conducting outreach, including handouts, a website on space weather for teachers, a slideshow presentation about the overall Solar Dynamic Observatory mission, and a DVD with videos explaining the construction and goals of the EVE instrument, a tour of LASP, and an overview of space science careers. The results and potential transferability of a pilot project developed through this effort that engaged English Second Language learners in a semester-long course on space weather that incorporated the used of a Sudden Ionospheric Disturbance (SID) Monitor will be highlighted.

  19. Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source

    Energy Technology Data Exchange (ETDEWEB)

    Dolgov, A., E-mail: a.dolgov@utwente.nl [MESA+ Institute for Nanotechnology, University of Twente, Enschede (Netherlands); Lopaev, D. [Skobeltsyn Institute of Nuclear Physics, Moscow State University, Moscow (Russian Federation); Lee, C.J. [MESA+ Institute for Nanotechnology, University of Twente, Enschede (Netherlands); Zoethout, E. [Dutch Institute for Fundamental Energy Research (DIFFER), Nieuwegein (Netherlands); Medvedev, V. [MESA+ Institute for Nanotechnology, University of Twente, Enschede (Netherlands); Yakushev, O. [Institute for Spectroscopy Russian Academy of Sciences, Moscow (Russian Federation); Bijkerk, F. [MESA+ Institute for Nanotechnology, University of Twente, Enschede (Netherlands)

    2015-10-30

    Highlights: • Carbon film grown during exposure to EUV radiation and high energy ions was studied. • The carbon film is highly resistant to chemical and physical sputtering. • Surface contamination of plasma-facing components is similar to hydrogenated DLC. - Abstract: Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiation from a pulsed tin plasma discharge. Our studies show that the film is chemically inert and has characteristics that are typical for a hydrogenated amorphous carbon film. It was experimentally observed that the film consists of carbon (∼70 at.%), oxygen (∼20 at.%) and hydrogen (bound to oxygen and carbon), along with a few at.% of tin. Most of the oxygen and hydrogen are most likely present as OH groups, chemically bound to carbon, indicating an important role for adsorbed water during the film formation process. It was observed that the film is predominantly sp{sup 3} hybridized carbon, as is typical for diamond-like carbon. The Raman spectra of the film, under 514 and 264 nm excitation, are typical for hydrogenated diamond-like carbon. Additionally, the lower etch rate and higher energy threshold in chemical ion sputtering in H{sub 2} plasma, compared to magnetron-sputtered carbon films, suggests that the film exhibits diamond-like carbon properties.

  20. Rest-frame ultraviolet-to-optical spectral characteristics of extremely metal-poor and metal-free galaxies

    CERN Document Server

    Inoue, Akio K

    2011-01-01

    Finding the first generation of galaxies in the early Universe is the greatest step forward for understanding galaxy formation and evolution. For strategic survey of such galaxies and interpretation of the obtained data, this paper presents an ultraviolet-to-optical spectral model of galaxies with a great care of the nebular emission. In particular, we present a machine-readable table of intensities of 119 nebular emission lines from Ly$\\alpha$ to the rest-frame 1 $\\mu$m as a function of metallicity from zero to the Solar one. Based on the spectral model, we present criteria of broad-band colours and equivalent widths of Ly$\\alpha$, He {\\sc ii} $\\lambda1640$, H$\\alpha$, H$\\beta$, [O {\\sc iii}] $\\lambda5007$ to select extremely metal-poor and metal-free galaxies although these criteria have uncertainty caused by the Lyman continuum escape fraction and the star formation duration. The criteria of broad-band colours will be useful to select candidates for spectroscopic follow-up from drop-out galaxies. We propos...

  1. Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources

    Science.gov (United States)

    Wachulak, P. W.; Bartnik, A.; Kostecki, J.; Wegrzynski, L.; Fok, T.; Jarocki, R.; Szczurek, M.; Fiedorowicz, H.

    2015-12-01

    We present a few examples of imaging experiments, which were possible using a compact laser-plasma extreme ultraviolet (EUV) and soft X-ray (SXR) source, based on a double stream gas puff target. This debris-free source was used in full-field EUV imaging to obtain magnified images of test samples, ZnO nanofibers and images of the membranes coated with salt crystals. The source was also employed for SXR microscopy in the "water-window" spectral range using grazing incidence Wolter type-I objective to image test samples and to perform the initial studies of biological objects. Gas puff target EUV source, spectrally tuned for 13.5 nm wavelength with multilayer mirror and thin film filters, was also used in variety of shadowgraphy experiments to study the density of newly developed modulated density gas puff targets. Finally, the source was also employed in EUV tomography experiments of low density objects with the goal to measure and optimize the density of the targets dedicated to high harmonic generation.

  2. Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics

    Science.gov (United States)

    Hirano, Ryoichi; Hatakeyama, Masahiro; Terao, Kenji; Watanabe, Hidehiro

    2016-04-01

    Extreme ultraviolet lithography (EUVL) patterned mask defect detection is a major issue that must be addressed to realize EUVL-based device fabrication. We have designed projection electron microscope (PEM) optics for integration into a mask inspection system, and the resulting PEM system performs well in half-pitch (hp) 16-nm-node EUVL patterned mask inspection applications. A learning system has been used in this PEM patterned mask inspection tool. The PEM identifies defects using the "defectivity" parameter that is derived from the acquired image characteristics. The learning system has been developed to reduce the labor and the costs associated with adjustment of the PEM's detection capabilities to cope with newly defined mask defects. The concepts behind this learning system and the parameter optimization flow are presented here. The learning system for the PEM is based on a library of registered defects. The learning system then optimizes the detection capability by reconciling previously registered defects with newly registered defects. Functional verification of the learning system is also described, and the system's detection capability is demonstrated by applying it to the inspection of hp 11-nm EUV masks. We can thus provide a user-friendly mask inspection system with reduced cost of ownership.

  3. Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

    CERN Document Server

    Dolgov, A; Rachimova, T; Kovalev, A; Vasilyeva, A; Lee, C J; Krivtsun, V M; Yakushev, O; Bijkerk, F

    2013-01-01

    Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per incident ion was estimated for different sample bias voltages and ion fluxes. It was found that H2 plasmas generally had higher cleaning rates than He plasmas: up to seven times higher for more negatively biased samples in EUV induced plasma. Moreover, for H2, EUV induced plasma was found to be 2-3 times more efficient at removing carbon than the SWD plasma. It was observed carbon removal during exposure to He is due to physical sputtering by He+ ions. In H2, on the other hand, the increase in carbon removal rates is due to chemical sputtering. This is a new C cleaning mechanism for EUV-induced plasma, which we call "E...

  4. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.

    Science.gov (United States)

    Lee, Soo Jin; Jung, Chang Yong; Park, Sung Jin; Hwangbo, Chang Kweun; Seo, Hwan Seok; Kim, Sung Soo; Lee, Nae-Eung

    2012-04-01

    Among the core EUVL (extreme ultra-violet lithography) technologies for nanoscale patterning below the 30 nm node for Si chip manufacturing, new materials and fabrication processes for high-performance EUVL masks are of considerable importance due to the use of new reflective optics. In this work, the selective etching of SnO2 (tin oxide) as a new absorber material, with high EUV absorbance due to its large extinction coefficient, for the binary mask structure of SnO2 (absorber layer)/Ru (capping/etch stop layer)/Mo-Si multilayer (reflective layer)/Si (substrate), was investigated. Because infinitely high selectivity of the SnO2 layer to the Ru ESL is required due to the ultrathin nature of the Ru layer, various etch parameters were assessed in the inductively coupled Cl2/Ar plasmas in order to find the process window required for infinitely high etch selectivity of the SnO2 layer. The results showed that the gas flow ratio and V(dc) value play an important role in determining the process window for the infinitely high etch selectivity of SnO2 to Ru ESL. The high EUV-absorbance SnO2 layer, patternable by a dry process, allows a smaller absorber thickness, which can mitigate the geometric shadowing effects observed for high-performance binary EUVL masks.

  5. Spectral investigations of photoionized plasmas induced in atomic and molecular gases using nanosecond extreme ultraviolet (EUV) pulses

    Energy Technology Data Exchange (ETDEWEB)

    Bartnik, A.; Fiedorowicz, H.; Wachulak, P. [Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw (Poland)

    2014-07-15

    In this paper, results of spectral investigations of low temperature photoionized plasmas, created by irradiation of gases with intense pulses of extreme ultraviolet (EUV) radiation from a laser-produced plasma (LPP) source, are presented. The LPP source was based on a double-stream KrXe/He gas-puff target irradiated with 4 ns/0.8 J/10 Hz Nd:YAG laser pulses. The most intense emission from the source spanned a relatively narrow spectral region λ ≈ 10–12 nm; however, spectrally integrated intensity at longer wavelengths was also significant. The EUV beam was focused on a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Irradiation of gases resulted in formation of photoionized plasmas emitting radiation in the EUV range. Radiation spectra, measured for plasmas produced in various gases, are dominated by emission lines, originating from single charged ions. Significant differences in spectral intensities and distributions between plasmas created in neon and molecular gases were observed.

  6. Spectroscopy of the extreme-ultraviolet source Feige 24 - The binary orbit and the mass of the white dwarf

    Science.gov (United States)

    Thorstensen, J. R.; Charles, P. A.; Bowyer, S.; Margon, B.

    1978-01-01

    Results are reported for coude spectroscopy of the extreme-ultraviolet white dwarf Feige 24. Radial velocities of the H-alpha, He I 5876-A, and He I 6678-A emission lines, and the underlying M-dwarf absorption features, were determined from spectrograms obtained with the Lick 3-m telescope. The velocities show a binary period of 4.239(+ or - 0.0015) days. The emission-line and absorption-line velocities agree in phase, which indicates that the emission lines originate in the atmosphere of the M-dwarf secondary as a result of reprocessing of the EUV radiation. This effect is modeled, and the observed amplitude of the emission-line variability is used to place a lower limit on the orbital inclination. From these and other data it is shown that the mass of the white dwarf lies between 0.46 and 1.24 solar masses. Some possible implications for the evolution of binary stars are briefly discussed.

  7. DIFFRACTION, REFRACTION, AND REFLECTION OF AN EXTREME-ULTRAVIOLET WAVE OBSERVED DURING ITS INTERACTIONS WITH REMOTE ACTIVE REGIONS

    Energy Technology Data Exchange (ETDEWEB)

    Shen Yuandeng; Liu Yu; Zhao Ruijuan; Tian Zhanjun [Yunnan Astronomical Observatory, Chinese Academy of Sciences, Kunming 650011 (China); Su Jiangtao [Key Laboratory of Solar Activity, Chinese Academy of Sciences, Beijing 100012 (China); Li Hui [Key Laboratory of Dark Matter and Space Astronomy, Chinese Academy of Sciences, Nanjing 210008 (China); Ichimoto, Kiyoshi; Shibata, Kazunari, E-mail: ydshen@ynao.ac.cn [Kwasan and Hida Observatories, Kyoto University, Kyoto 6078471 (Japan)

    2013-08-20

    We present observations of the diffraction, refraction, and reflection of a global extreme-ultraviolet (EUV) wave propagating in the solar corona. These intriguing phenomena are observed when the wave interacts with two remote active regions, and together they exhibit properties of an EUV wave. When the wave approached AR11465, it became weaker and finally disappeared in the active region, but a few minutes later a new wavefront appeared behind the active region, and it was not concentric with the incoming wave. In addition, a reflected wave was also simultaneously observed on the wave incoming side. When the wave approached AR11459, it transmitted through the active region directly and without reflection. The formation of the new wavefront and the transmission could be explained with diffraction and refraction effects, respectively. We propose that the different behaviors observed during the interactions may be caused by different speed gradients at the boundaries of the two active regions. We find that the EUV wave formed ahead of a group of expanding loops a few minutes after the start of the loops' expansion, which represents the initiation of the associated coronal mass ejection (CME). Based on these results, we conclude that the EUV wave should be a nonlinear magnetosonic wave or shock driven by the associated CME, which propagated faster than the ambient fast mode speed and gradually slowed down to an ordinary linear wave. Our observations support the hybrid model that includes both fast wave and slow non-wave components.

  8. Excluded volume effects caused by high concentration addition of acid generators in chemically amplified resists used for extreme ultraviolet lithography

    Science.gov (United States)

    Kozawa, Takahiro; Watanabe, Kyoko; Matsuoka, Kyoko; Yamamoto, Hiroki; Komuro, Yoshitaka; Kawana, Daisuke; Yamazaki, Akiyoshi

    2017-08-01

    The resolution of lithography used for the high-volume production of semiconductor devices has been improved to meet the market demands for highly integrated circuits. With the reduction in feature size, the molecular size becomes non-negligible in the resist material design. In this study, the excluded volume effects caused by adding high-concentration acid generators were investigated for triphenylsulfonium nonaflate. The resist film density was measured by X-ray diffractometry. The dependences of absorption coefficient and protected unit concentration on acid generator weight ratio were calculated from the measured film density. Using these values, the effects on the decomposition yield of acid generators, the protected unit fluctuation, and the line edge roughness (LER) were evaluated by simulation on the basis of sensitization and reaction mechanisms of chemically amplified extreme ultraviolet resists. The positive effects of the increase in acid generator weight ratio on LER were predominant below the acid generator weight ratio of 0.3, while the negative effects became equivalent to the positive effects above the acid generator weight ratio of 0.3 owing to the excluded volume effects.

  9. An Upper Limit on the Ratio Between the Extreme Ultraviolet and the Bolometric Luminosities of Stars Hosting Habitable Planets

    Indian Academy of Sciences (India)

    Sujan Sengupta

    2016-06-01

    A large number of terrestrial planets in the classical habitable zone of stars of different spectral types have already been discovered and many are expected to be discovered in the near future. However, owing to the lack of knowledge on the atmospheric properties, the ambient environment of such planets are unknown. It is known that sufficient amount of Extreme Ultraviolet (EUV) radiation from the star can drive hydrodynamic outflow of hydrogen that may drag heavier species from the atmosphere of the planet. If the rate of mass loss is sufficiently high, then substantial amount of volatiles would escape causing the planet to become uninhabitable. Considering energy-limited hydrodynamical mass loss with an escape rate that causes oxygen to escape alongwith hydrogen, an upper limit for the ratio between the EUV and the bolometric luminosities of stars which constrains the habitability of planets around them is presented here. Application of the limit to planet-hosting stars with known EUV luminosities implies that many M-type of stars should not have habitable planets around them.

  10. Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

    Science.gov (United States)

    Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Pret, Alessandro Vaglio; Gronheid, Roel

    2013-04-01

    One of the main challenges for developing extreme ultraviolet resists is to satisfy critical dimension uniformity (CDU) and sidewall roughness of contacts to the allowable limit. To this end, further understanding of the effects of resist ingredients on CDU and contact edge roughness (CER) is required. We investigate the effects of a photoacid generator (PAG), sensitizer and quencher concentrations on the CDU and CER. We find that the dependencies of CDU on sensitizer and quencher are dominated by photon shot noise (PSN) effects whereas a more complicated interplay between PSN and PAG distribution statistics should be considered in the dependence of CDU on PAG concentration. The estimated CER parameters [root mean square (RMS) value and correlation length ξ] exhibit a merging trend when plotted against the final critical dimension (CD). In addition, RMS value increases with exposure dose and PAG loading contrary to shot noise expectations. Power spectrum analysis reveals the dominant contribution of low-frequency undulations to CER, which is attributed to the enhanced interaction along specific directions between the aerial image and/or acid kinetics of nearby contacts. This inter-contact effect is further intensified with CD for fixed pitch and may explain the observed CER behavior.

  11. Flux rope, hyperbolic flux tube, and late extreme ultraviolet phases in a non-eruptive circular-ribbon flare

    Science.gov (United States)

    Masson, Sophie; Pariat, Étienne; Valori, Gherardo; Deng, Na; Liu, Chang; Wang, Haimin; Reid, Hamish

    2017-08-01

    Context. The dynamics of ultraviolet (UV) emissions during solar flares provides constraints on the physical mechanisms involved in the trigger and the evolution of flares. In particular it provides some information on the location of the reconnection sites and the associated magnetic fluxes. In this respect, confined flares are far less understood than eruptive flares generating coronal mass ejections. Aims: We present a detailed study of a confined circular flare dynamics associated with three UV late phases in order to understand more precisely which topological elements are present and how they constrain the dynamics of the flare. Methods: We perform a non-linear force-free field extrapolation of the confined flare observed with the Helioseismic and Magnetic Imager (HMI) and Atmospheric Imaging Assembly (AIA) instruments on board Solar Dynamics Observatory (SDO). From the 3D magnetic field we compute the squashing factor and we analyse its distribution. Conjointly, we analyse the AIA extreme ultraviolet (EUV) light curves and images in order to identify the post-flare loops, and their temporal and thermal evolution. By combining the two analyses we are able to propose a detailed scenario that explains the dynamics of the flare. Results: Our topological analysis shows that in addition to a null-point topology with the fan separatrix, the spine lines and its surrounding quasi-separatix layer (QSL) halo (typical for a circular flare), a flux rope and its hyperbolic flux tube (HFT) are enclosed below the null. By comparing the magnetic field topology and the EUV post-flare loops we obtain an almost perfect match between the footpoints of the separatrices and the EUV 1600 Å ribbons and between the HFT field line footpoints and bright spots observed inside the circular ribbons. We show, for the first time in a confined flare, that magnetic reconnection occurred initially at the HFT below the flux rope. Reconnection at the null point between the flux rope and the

  12. Effects of XUV radiation on circumbinary planets

    CERN Document Server

    Sanz-Forcada, J; Micela, G

    2014-01-01

    Several circumbinary planets have recently been discovered. The orbit of a planet around a binary stellar system poses several dynamic constraints. The effects that radiation from the host stars may have on the planet atmospheres must be considered. Because of the configuration of a close binary system, these stars have a high rotation rate, which causes a permanent state of high stellar activity and copious XUV radiation. The accumulated effects are stronger than for exoplanets around single stars, and cause a faster evaporation of their atmospheres. We evaluate the effects that stellar radiation has on the evaporation of exoplanets around binary systems and on the survival of these planets. We considered the XUV spectral range to account for the photons that are easily absorbed by a planet atmosphere that is mainly composed of hydrogen. A more complex atmospheric composition is expected to absorb this radiation more efficiently. We used direct X-ray observations to evaluate the energy in the X-rays range an...

  13. Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

    Energy Technology Data Exchange (ETDEWEB)

    Aquila, Andrew Lee [Univ. of California, Berkeley, CA (United States)

    2009-05-21

    The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes the design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs

  14. Mechanism and model of atomic hydrogen cleaning for different types of carbon contamination on extreme ultraviolet multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Song, Yuan [State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Lu, Qipeng, E-mail: Luqipeng51@126.com [State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033 (China); Gong, Xuepeng [State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033 (China)

    2016-08-01

    The use of atomic hydrogen to clean carbon contaminants on multilayers in extreme ultraviolet lithography systems has been extensively investigated. Additional knowledge of the cleaning rate would not only provide a better understanding of the reaction mechanism but would also inform the industry's cleaning process. In this paper, which focuses on the atomic-hydrogen-based carbon contamination cleaning process, a possible mechanism for the associated reactions is studied and a cleaning model is established. The calculated results are in good agreement with the existing experimental data in the literature. The influences of the main factors – such as activation energy and types of contamination – on the cleaning rate are addressed by the model. The model shows that the cleaning rate depends on the type of carbon contamination. The rate for a polymer-like carbon layer is higher than the rate for graphitic and diamond-like carbon layers. At 340 K, the rate for a polymer-like carbon layer is 10 times higher than for graphitic carbon layers. This model could be used effectively to predict and evaluate the cleaning rates for various carbon contamination types. - Highlights: • Mechanism of H{sup 0} cleaning with C contamination on EUV multilayers is given. • Reflectivity of multilayers rely on various types of C contamination is analyzed. • A model of H{sup 0} cleaning various types of C contamination layers is built. • Accurate predicting and evaluating the rate of H{sup 0} cleaning by the mode is proved. • It would be beneficial for improving H{sup 0} cleaning process of carbon layers.

  15. Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

    Science.gov (United States)

    Sertsu, M. G.; Giglia, A.; Brose, S.; Park, D.; Wang, Z. S.; Mayer, J.; Juschkin, L.; Nicolosi, P.

    2016-03-01

    New multilayers of boron carbide/cerium dioxide (B4C/CeO2) combination on silicon (Si) substrate are manufactured to represent reflective-optics candidates for future lithography at 6.x nm wavelength. This is one of only a few attempts to make multilayers of this kind. Combination of several innovative experiments enables detailed study of optical properties, structural properties, and interface profiles of the multilayers in order to open up a room for further optimization of the manufacturing process. The interface profile is visualized by high-angle annular dark-field imaging which provides highly sensitive contrast to atomic number. Synchrotron based at-wavelength extreme ultraviolet (EUV) reflectance measurements near the boron (B) absorption edge allow derivation of optical parameters with high sensitivity to local atom interactions. X-ray reflectivity measurements at Cu-Kalpha (8 keV ) determine the period of multilayers with high in-depth resolution. By combining these measurements and choosing robust nonlinear curve fitting algorithms, accuracy of the results has been significantly improved. It also enables a comprehensive characterization of multilayers. Interface diffusion is determined to be a major cause for the low reflectivity performance. Optical constants of B4C and CeO2 layers are derived in EUV wavelengths. Besides, optical properties and asymmetric thicknesses of inter-diffusion layers (interlayers) in EUV wavelengths near the boron edge are determined. Finally, ideal reflectivity of the B4C/CeO2 combination is calculated by using optical constants derived from the proposed measurements in order to evaluate the potentiality of the design.

  16. THE INFLUENCE OF THE EXTREME ULTRAVIOLET SPECTRAL ENERGY DISTRIBUTION ON THE STRUCTURE AND COMPOSITION OF THE UPPER ATMOSPHERE OF EXOPLANETS

    Energy Technology Data Exchange (ETDEWEB)

    Guo, J. H. [Yunnan Observatories, Chinese Academy of Sciences, P.O. Box 110, Kunming 650011 (China); Ben-Jaffel, Lotfi, E-mail: guojh@ynao.ac.cn, E-mail: bjaffel@iap.fr [Sorbonne Universités, UPMC Univ. Paris 6 et CNRS, UMR 7095, Institut Astrophysique de Paris, F-75014 Paris (France)

    2016-02-20

    By varying the profiles of stellar extreme ultraviolet (EUV) spectral energy distributions (SEDs), we tested the influences of stellar EUV SEDs on the physical and chemical properties of an escaping atmosphere. We apply our model to study four exoplanets: HD 189733b, HD 209458b, GJ 436b, and Kepler-11b. We find that the total mass loss rates of an exoplanet, which are determined mainly by the integrated fluxes, are moderately affected by the profiles of the EUV SED, but the composition and species distributions in the atmosphere can be dramatically modified by the different profiles of the EUV SED. For exoplanets with a high hydrodynamic escape parameter (λ), the amount of atomic hydrogen produced by photoionization at different altitudes can vary by one to two orders of magnitude with the variation of stellar EUV SEDs. The effect of photoionization of H is prominent when the EUV SED is dominated by the low-energy spectral region (400–900 Å), which pushes the transition of H/H{sup +} to low altitudes. In contrast, the transition of H/H{sup +} moves to higher altitudes when most photons are concentrated in the high-energy spectral region (50–400 Å). For exoplanets with a low λ, the lower temperatures of the atmosphere make many chemical reactions so important that photoionization alone can no longer determine the composition of the escaping atmosphere. For HD 189733b, it is possible to explain the time variability of Lyα between 2010 and 2011 by a change in the EUV SED of the host K-type star, yet invoking only thermal H i in the atmosphere.

  17. Fabrication of Thiol-Ene "Clickable" Copolymer-Brush Nanostructures on Polymeric Substrates via Extreme Ultraviolet Interference Lithography.

    Science.gov (United States)

    Dübner, Matthias; Gevrek, Tugce N; Sanyal, Amitav; Spencer, Nicholas D; Padeste, Celestino

    2015-06-03

    We demonstrate a new approach to grafting thiol-reactive nanopatterned copolymer-brush structures on polymeric substrates by means of extreme ultraviolet (EUV) interference lithography. The copolymer brushes were designed to contain maleimide functional groups as thiol-reactive centers. Fluoropolymer films were exposed to EUV radiation at the X-ray interference lithography beamline (XIL-II) at the Swiss Light Source, in order to create radical patterns on their surfaces. The radicals served as initiators for the copolymerization of thiol-ene "clickable" brushes, composed of a furan-protected maleimide monomer (FuMaMA) and different methacrylates, namely, methyl methacrylate (MMA), ethylene glycol methyl ether methacrylate (EGMA), or poly(ethylene glycol) methyl ether methacrylate (PEGMA). Copolymerization with ethylene-glycol-containing monomers provides antibiofouling properties to these surfaces. The number of reactive centers on the grafted brush structures can be tailored by varying the monomer ratios in the feed. Grafted copolymers were characterized by using attenuated total reflection infrared (ATR-IR) spectroscopy. The reactive maleimide methacrylate (MaMA) units were utilized to conjugate thiol-containing moieties using the nucleophilic Michael-addition reaction, which proceeds at room temperature without the need for any metal-based catalyst. Using this approach, a variety of functionalities was introduced to yield polyelectrolytes, as well as fluorescent and light-responsive polymer-brush structures. Functionalization of the brush structures was demonstrated via ATR-IR and UV-vis spectroscopy and fluorescence microscopy, and was also indicated by a color switch. Furthermore, grafted surfaces were generated via plasma activation, showing a strongly increased wettability for polyelectrolytes and a reversible switch in static water contact angle (CA) of up to 18° for P(EGMA-co-MaMA-SP) brushes, upon exposure to alternating visible and UV-light irradiation.

  18. Soft x-ray microscopy and extreme ultraviolet lithography: Imaging in the 20-50 nm regime (abstract) (invited)

    Science.gov (United States)

    Attwood, David

    2002-03-01

    Advances in short wavelength optics, covering the range from 1 to 14 nm, are providing new results and new opportunities. Zone plate lenses [E. Anderson et al., J. Vac. Sci. Techno. B 18, 2970 (2000)] for soft x-ray microscopy [G. Denbeaux, Rev. Sci. Instrum. (these proceedings); W. Chao, Proc. SPIE 4146, 171 (2000)] are now made to high accuracy with outer zone widths of 25 nm, and demonstrated resolution of 23 nm with proper illumination and stability. These permit important advances in the study of protein specific transport and structure in the life sciences [C. Larabell (private communication); W. Meyer-Ilse et al., J. Microsc. 201, 395 (2001)] and the study of magnetic materials [P. Fischer et al., J. Synchrotron. Radiat. 8, 325 (2001)] with elemental sensitivity at the resolution of individual domains. Major corporations (members of the EUV Limited Liability Company are Intel, Motorola, AMD, Micron, Infineon, and IBM) are now preparing the path for the fabrication of future computer chips, in the years 2007 and beyond, using multilayer coated reflective optics, which achieve reflectivities of 70% in the 11-14 nm region [T. Barbee et al., Appl. Opt. 24, 883 (1985); C. Montcalm et al., Proc. SPIE 3676, 710 (1999)]. These coated optics are to be incorporated in extreme ultraviolet (EUV) print cameras, known as "steppers." Electronic patterns with features in the range of 50-70 nm have been printed. The first alpha tool stepper recently demonstrated all critical technologies [D. Tichenor et al., Proc. SPIE 4343, 19 (2001)] needed for EUV lithography. Preproduction beta tools are targeted for delivery by leading suppliers [ASML, the Netherlands, at the SPIE Microlithography Conference, Santa Clara, CA, March 2001] in 2004, with high volume production tools available in late 2006 for manufacturing in 2007. New results in these two areas will be discussed in the context of the synergy of science and technology.

  19. The MUSCLES Treasury Survey. II. Intrinsic LYα and Extreme Ultraviolet Spectra of K and M Dwarfs with Exoplanets*

    Science.gov (United States)

    Youngblood, Allison; France, Kevin; Parke Loyd, R. O.; Linsky, Jeffrey L.; Redfield, Seth; Schneider, P. Christian; Wood, Brian E.; Brown, Alexander; Froning, Cynthia; Miguel, Yamila; Rugheimer, Sarah; Walkowicz, Lucianne

    2016-06-01

    The ultraviolet (UV) spectral energy distributions (SEDs) of low-mass (K- and M-type) stars play a critical role in the heating and chemistry of exoplanet atmospheres, but are not observationally well-constrained. Direct observations of the intrinsic flux of the Lyα line (the dominant source of UV photons from low-mass stars) are challenging, as interstellar H i absorbs the entire line core for even the closest stars. To address the existing gap in empirical constraints on the UV flux of K and M dwarfs, the MUSCLES Hubble Space Telescope Treasury Survey has obtained UV observations of 11 nearby M and K dwarfs hosting exoplanets. This paper presents the Lyα and extreme-UV spectral reconstructions for the MUSCLES targets. Most targets are optically inactive, but all exhibit significant UV activity. We use a Markov Chain Monte Carlo technique to correct the observed Lyα profiles for interstellar absorption, and we employ empirical relations to compute the extreme-UV SED from the intrinsic Lyα flux in ˜100 Å bins from 100-1170 Å. The reconstructed Lyα profiles have 300 km s-1 broad cores, while >1% of the total intrinsic Lyα flux is measured in extended wings between 300 and 1200 km s-1. The Lyα surface flux positively correlates with the Mg ii surface flux and negatively correlates with the stellar rotation period. Stars with larger Lyα surface flux also tend to have larger surface flux in ions formed at higher temperatures, but these correlations remain statistically insignificant in our sample of 11 stars. We also present H i column density measurements for 10 new sightlines through the local interstellar medium. Based on observations made with the NASA/ESA Hubble Space Telescope, obtained from the data archive at the Space Telescope Science Institute. STScI is operated by the Association of Universities for Research in Astronomy, Inc. under NASA contract NAS 5-26555.

  20. Extreme ultraviolet interferometry

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A. [Univ. of California, Berkeley, CA (United States). Dept. of Physics

    1997-12-01

    EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical dimension and smaller. In order to achieve diffraction-limited performance, all-reflective multilayer-coated lithographic imaging systems operating near 13-nm wavelength and 0.1 NA have system wavefront tolerances of 0.27 nm, or 0.02 waves RMS. Owing to the highly-sensitive resonant reflective properties of multilayer mirrors and extraordinarily tight tolerances set forth for their fabrication, EUV optical systems require at-wavelength EUV interferometry for final alignment and qualification. This dissertation discusses the development and successful implementation of high-accuracy EUV interferometric techniques. Proof-of-principle experiments with a prototype EUV point-diffraction interferometer for the measurement of Fresnel zoneplate lenses first demonstrated sub-wavelength EUV interferometric capability. These experiments spurred the development of the superior phase-shifting point-diffraction interferometer (PS/PDI), which has been implemented for the testing of an all-reflective lithographic-quality EUV optical system. Both systems rely on pinhole diffraction to produce spherical reference wavefronts in a common-path geometry. Extensive experiments demonstrate EUV wavefront-measuring precision beyond 0.02 waves RMS. EUV imaging experiments provide verification of the high-accuracy of the point-diffraction principle, and demonstrate the utility of the measurements in successfully predicting imaging performance. Complementary to the experimental research, several areas of theoretical investigation related to the novel PS/PDI system are presented. First-principles electromagnetic field simulations of pinhole diffraction are conducted to ascertain the upper limits of measurement accuracy and to guide selection of the pinhole diameter. Investigations of the relative merits of different PS/PDI configurations accompany a general study of the most significant sources of systematic measurement errors. To overcome a variety of experimental difficulties, several new methods in interferogram analysis and phase-retrieval were developed: the Fourier-Transform Method of Phase-Shift Determination, which uses Fourier-domain analysis to improve the accuracy of phase-shifting interferometry; the Fourier-Transform Guided Unwrap Method, which was developed to overcome difficulties associated with a high density of mid-spatial-frequency blemishes and which uses a low-spatial-frequency approximation to the measured wavefront to guide the phase unwrapping in the presence of noise; and, finally, an expedient method of Gram-Schmidt orthogonalization which facilitates polynomial basis transformations in wave-front surface fitting procedures.

  1. Extreme hydrodynamic atmospheric loss near the critical thermal escape regime

    CERN Document Server

    Erkaev, N V; Odert, P; Kulikov, Yu N; Kislyakova, K G

    2015-01-01

    By considering martian-like planetary embryos inside the habitable zone of solar-like stars we study the behavior of the hydrodynamic atmospheric escape of hydrogen for small values of the Jeans escape parameter $\\beta < 3$, near the base of the thermosphere, that is defined as a ratio of the gravitational and thermal energy. Our study is based on a 1-D hydrodynamic upper atmosphere model that calculates the volume heating rate in a hydrogen dominated thermosphere due to the absorption of the stellar soft X-ray and extreme ultraviolet (XUV) flux. We find that when the $\\beta$ value near the mesopause/homopause level exceeds a critical value of $\\sim$2.5, there exists a steady hydrodynamic solution with a smooth transition from subsonic to supersonic flow. For a fixed XUV flux, the escape rate of the upper atmosphere is an increasing function of the temperature at the lower boundary. Our model results indicate a crucial enhancement of the atmospheric escape rate, when the Jeans escape parameter $\\beta$ decr...

  2. Desorption of H atoms from graphite (0001) using XUV free electron laser pulses

    DEFF Research Database (Denmark)

    Siemer, B.; Olsen, Thomas; Hoger, T.;

    2010-01-01

    , and identifies the highest vibrational state in the adsorbate potential as a major source for the slow atoms. It is evident that multiple electron scattering processes are required for this desorption. A direct electronic excitation of a repulsive hydrogen-carbon bond seems not to be important.......The desorption of neutral H atoms from graphite with femtosecond XUV pulses is reported. The velocity distribution of the atoms peaks at extremely low kinetic energies. A DFT-based electron scattering calculation traces this distribution to desorption out of specific adsorption sites on graphite...

  3. Analysis of ultraviolet and extreme-ultraviolet spectra of the DA white dwarf G 191-B2B using self-consistent diffusion models

    Science.gov (United States)

    Dreizler, S.; Wolff, B.

    1999-08-01

    We present a multi-wavelength spectral analysis of the DA white dwarf G 191-B2B. The employed atmospheric models account for gravitational settling and radiative levitation, which are, for the first time, calculated self-consistently with the atmospheric structure. The resulting spectra can reproduce the complete EUVE spectrum and the ultraviolet lines of iron. Some restrictions regarding the UV lines of other elements (C, N, O, Ni), however, still remain. In contrast to homogeneous models, it is not necessary to introduce additional photospheric or interstellar absorbers to account for the high opacity at lambda Research in Astronomy, Inc. under NASA contract NAS 5-26555.

  4. Measurement of zone plate efficiencies in the extreme ultraviolet and applications to radiation monitors for absolute spectral emission

    Science.gov (United States)

    Seely, John; Holland, Glenn; Bremer, James C.; Zukowski, Tim; Feser, Michael; Feng, Yan; Kjornrattanawanich, Benjawan; Goray, Leonid

    2006-08-01

    The diffraction efficiencies of a Fresnel zone plate (ZP), fabricated by Xradia Inc. using the electron-beam writing technique, were measured using polarized, monochromatic synchrotron radiation in the extreme ultraviolet wavelength range 3.4-22 nm. The ZP had 2 mm diameter, 3330 zones, 150 nm outer zone width, and a 1 mm central occulter. The ZP was supported by a 100 nm thick Si 3N 4 membrane. The diffraction patterns were recorded by CMOS imagers with phosphor coatings and with 5.2 μm or 48 μm pixels. The focused +n orders (n=1-4), the diverging -1 order, and the undiffracted 0 order were observed as functions of wavelength and off-axis tilt angle. Sub-pixel focusing of the +n orders was achieved. The measured efficiency in the +1 order was in the 5% to 30% range with the phase-shift enhanced efficiency occurring at 8.3 nm where the gold bars are partially transmitting. The +2 and higher order efficiencies were much lower than the +1 order efficiency. The efficiencies were constant when the zone plate was tilted by angles up to +/-1° from the incident radiation beam. This work indicates the feasibility and benefits of using zone plates to measure the absolute EUV spectral emissions from solar and laboratory sources: relatively high EUV efficiency in the focused +1 order, good out-of-band rejection resulting from the low higher-order efficiencies and the ZP focusing properties, insensitivity to (unfocused) visible light scattered by the ZP, flat response with off-axis angle, and insensitivity to the polarization of the radiation based on the ZP circular symmetry. EUV sensors with Fresnel zone plates potentially have many advantages over existing sensors intended to accurately measure absolute EUV emission levels, such as those implemented on the GOES N-P satellites that use transmission gratings which have off-axis sensitivity variations and poor out-of-band EUV and visible light rejection, and other solar and laboratory sensors using reflection gratings which

  5. A fast-time-response extreme ultraviolet spectrometer for measurement of impurity line emissions in the Experimental Advanced Superconducting Tokamak

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Ling; Xu, Zong; Wu, Zhenwei; Zhang, Pengfei; Wu, Chengrui; Gao, Wei; Shen, Junsong; Chen, Yingjie; Liu, Xiang; Wang, Yumin; Gong, Xianzu; Hu, Liqun; Chen, Junlin; Zhang, Xiaodong; Wan, Baonian; Li, Jiangang [Institute of Plasma Physics Chinese Academy of Sciences, Hefei 230026, Anhui (China); Morita, Shigeru; Ohishi, Tetsutarou; Goto, Motoshi [National Institute for Fusion Science, Toki 509-5292, Gifu (Japan); Department of Fusion Science, Graduate University for Advanced Studies, Toki 509-5292, Gifu (Japan); Dong, Chunfeng [Southwestern Institute of Physics, Chengdu 610041, Sichuan (China); and others

    2015-12-15

    A flat-field extreme ultraviolet (EUV) spectrometer working in the 20-500 Å wavelength range with fast time response has been newly developed to measure line emissions from highly ionized tungsten in the Experimental Advanced Superconducting Tokamak (EAST) with a tungsten divertor, while the monitoring of light and medium impurities is also an aim in the present development. A flat-field focal plane for spectral image detection is made by a laminar-type varied-line-spacing concave holographic grating with an angle of incidence of 87°. A back-illuminated charge-coupled device (CCD) with a total size of 26.6 × 6.6 mm{sup 2} and pixel numbers of 1024 × 255 (26 × 26 μm{sup 2}/pixel) is used for recording the focal image of spectral lines. An excellent spectral resolution of Δλ{sub 0} = 3-4 pixels, where Δλ{sub 0} is defined as full width at the foot position of a spectral line, is obtained at the 80-400 Å wavelength range after careful adjustment of the grating and CCD positions. The high signal readout rate of the CCD can improve the temporal resolution of time-resolved spectra when the CCD is operated in the full vertical binning mode. It is usually operated at 5 ms per frame. If the vertical size of the CCD is reduced with a narrow slit, the time response becomes faster. The high-time response in the spectral measurement therefore makes possible a variety of spectroscopic studies, e.g., impurity behavior in long pulse discharges with edge-localized mode bursts. An absolute intensity calibration of the EUV spectrometer is also carried out with a technique using the EUV bremsstrahlung continuum at 20-150 Å for quantitative data analysis. Thus, the high-time resolution tungsten spectra have been successfully observed with good spectral resolution using the present EUV spectrometer system. Typical tungsten spectra in the EUV wavelength range observed from EAST discharges are presented with absolute intensity and spectral identification.

  6. Combined microscopies study of the C-contamination induced by extreme-ultraviolet radiation: A surface-dependent secondary-electron-based model

    Science.gov (United States)

    Prezioso, S.; Donarelli, M.; Bisti, F.; Palladino, L.; Santucci, S.; Spadoni, S.; Avaro, L.; Liscio, A.; Palermo, V.; Ottaviano, L.

    2012-05-01

    SiO2 and Al2O3 surfaces exposed to periodically modulated extreme ultraviolet (EUV) light (λ = 46.9 nm) have been investigated at the μm scale by optical microscopy, scanning electron microscopy, scanning Auger microscopy, atomic force microscopy, and Kelvin probe force microscopy. The formation of a carbon contamination layer preserving the same periodical modulation of the EUV dose has been observed. The mechanisms of hydrocarbon molecules deposition have been studied with the help of correlation plots between the modulated Auger signal and the corresponding EUV dose. A surface-dependent secondary-electron-based model has been proposed.

  7. Combined microscopies study of the C-contamination induced by extreme-ultraviolet radiation: A surface-dependent secondary-electron-based model

    Energy Technology Data Exchange (ETDEWEB)

    Prezioso, S.; Donarelli, M.; Bisti, F.; Palladino, L.; Santucci, S.; Ottaviano, L. [Dip. di Fisica, Universita dell' Aquila, Via Vetoio, 67100 L' Aquila (Italy); Spadoni, S.; Avaro, L. [Micron, Process R and D, Via C. Olivetti 2, 20864 Agrate Brianza (Italy); Liscio, A.; Palermo, V. [CNR-ISOF, Via Gobetti 101, 40129 Bologna (Italy)

    2012-05-14

    SiO{sub 2} and Al{sub 2}O{sub 3} surfaces exposed to periodically modulated extreme ultraviolet (EUV) light ({lambda} = 46.9 nm) have been investigated at the {mu}m scale by optical microscopy, scanning electron microscopy, scanning Auger microscopy, atomic force microscopy, and Kelvin probe force microscopy. The formation of a carbon contamination layer preserving the same periodical modulation of the EUV dose has been observed. The mechanisms of hydrocarbon molecules deposition have been studied with the help of correlation plots between the modulated Auger signal and the corresponding EUV dose. A surface-dependent secondary-electron-based model has been proposed.

  8. Record high extreme-ultraviolet efficiency at near-normal incidence from a multilayer-coated polymer-overcoated blazed ion-etched holographic grating

    Science.gov (United States)

    Kowalski, M. P.; Cruddace, R. G.; Heidemann, K. F.; Lenke, R.; Kierey, H.; Barbee, T. W., Jr.; Hunter, W. R.

    2004-12-01

    We have measured the extreme-ultraviolet (EUV) efficiency of a polymer-overcoated blazed ion-etched holographic test grating. The grating had a magnetron-sputtered Mo2C /Si multilayer coating matched to the grating blaze angle of 2.78°. At an angle of incidence of 5.6° and a wavelength of 15.79 nm, the measured efficiency peaks in the second outside order at 29.9%. The derived groove efficiency is 53.0%. To the best of our knowledge these are the highest values obtained yet at EUV wavelengths from a holographic ion-etched blazed grating.

  9. Harmonium: A pulse preserving source of monochromatic extreme ultraviolet (30–110 eV) radiation for ultrafast photoelectron spectroscopy of liquids

    OpenAIRE

    2016-01-01

    A tuneable repetition rate extreme ultraviolet source (Harmonium) for time resolved photoelectron spectroscopy of liquids is presented. High harmonic generation produces 30-110 eV photons, with fluxes ranging from similar to 2 x 10(11) photons/s at 36 eV to similar to 2 x 10(8) photons/s at 100 eV. Four different gratings in a time-preserving grating monochromator provide either high energy resolution (0.2 eV) or high temporal resolution (40 fs) between 30 and 110 eV. Laser assisted photoemis...

  10. Absolute calibration of a multilayer-based XUV diagnostic

    CERN Document Server

    Stuik, R; Tümmler, J; Bijkerk, F

    2002-01-01

    A portable, universal narrowband XUV diagnostic suitable for calibration of various XUV light sources, was built, tested and fully calibrated. The diagnostic allows measurement of the absolute XUV energy and average power in two selected wavelength bands, at 11.4 and 13.4 nm. In addition, the pulse-to-pulse and long-term XUV stability of the source can be assessed, as well as the contamination of multilayer XUV optics exposed to the source. This paper describes the full calibration procedure: all optical elements were calibrated at the wavelength of operation by Physikalisch-Technische Bundesanstalt at the storage ring Bessy II, a full analysis of geometrical factors was done, and the influence of the spectral emissivity of the source on the calibration was analyzed in detail. The calibration was performed both for the centroid wavelength as for the full bandwidth of the diagnostic. The total uncertainty in the absolute calibration allowed measurement of source characteristics with an uncertainty of less than...

  11. Amorphous InGaMgO Ultraviolet Photo-TFT with Ultrahigh Photosensitivity and Extremely Large Responsivity

    Directory of Open Access Journals (Sweden)

    Yiyu Zhang

    2017-02-01

    Full Text Available Recently, amorphous InGaZnO ultraviolet photo thin-film transistors have exhibited great potential for application in future display technologies. Nevertheless, the transmittance of amorphous InGaZnO (~80% is still not high enough, resulting in the relatively large sacrifice of aperture ratio for each sensor pixel. In this work, the ultraviolet photo thin-film transistor based on amorphous InGaMgO, which processes a larger bandgap and higher transmission compared to amorphous InGaZnO, was proposed and investigated. Furthermore, the effects of post-deposition annealing in oxygen on both the material and ultraviolet detection characteristics of amorphous InGaMgO were also comprehensively studied. It was found that oxygen post-deposition annealing can effectively reduce oxygen vacancies, leading to an optimized device performance, including lower dark current, higher sensitivity, and larger responsivity. We attributed it to the combined effect of the reduction in donor states and recombination centers, both of which are related to oxygen vacancies. As a result, the 240-min annealed device exhibited the lowest dark current of 1.7 × 10−10 A, the highest photosensitivity of 3.9 × 106, and the largest responsivity of 1.5 × 104 A/W. Therefore, our findings have revealed that amorphous InGaMgO photo thin-film transistors are a very promising alternative for UV detection, especially for application in touch-free interactive displays.

  12. XUV-initiated high harmonic generation: driving inner valence electrons using below-threshold-energy XUV light

    CERN Document Server

    Brown, A C

    2016-01-01

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in XUV-initiated high-harmonic generation in neon. By probing the atom with a low energy (below the 2s ionisation threshold) ultrashort XUV pulse, the 2p electron is steered away from the core, while the 2s electron is enabled to describe recollision trajectories. By selectively suppressing the 2p recollision trajectories we can resolve the contribution of the 2s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2s electron, which allows for an intuitive understanding of the process.

  13. Ultrafast XUV spectroscopy: Unveiling the nature of electronic couplings in molecular dynamics

    Science.gov (United States)

    Timmers, Henry Robert

    Molecules are traditionally treated quantum mechanically using the Born-Oppenheimer formalism. In this formalism, different electronic states of the molecule are treated independently. However, most photo-initiated phenomena occurring in nature are driven by the couplings between different electronic states in both isolated molecules and molecular aggregates, and therefore occur beyond the Born-Oppenheimer formalism. These couplings are relevant in reactions relating to the perception of vision in the human eye, the oxidative damage and repair of DNA, the harvesting of light in photosynthesis, and the transfer of charge across large chains of molecules. While these reaction dynamics have traditionally been studied with visible and ultraviolet spectroscopy, attosecond XUV pulses formed through the process of high harmonic generation form a perfect tool for probing coupled electronic dynamics in molecules. In this thesis, I will present our work in using ultrafast, XUV spectroscopy to study these dynamics in molecules of increasing complexity. We begin by probing the relaxation dynamics of superexcited states in diatomic O 2. These states can relax via two types of electronic couplings, either through autoionization or neutral dissociation. We find that our pump-probe scheme can disentangle the two relaxation mechanisms and independently measure their contributing lifetimes. Next, we present our work in observing a coherent electron hole wavepacket initiated by the ionization of polyatomic CO 2 near a conical intersection. The electron-nuclear couplings near the conical intersection drive the electron hole between different orbital configurations. We find that we can not only measure the lifetime of quantum coherence in the electron hole wavepacket, but also control its evolution with a strong, infrared probing field. Finally, we propose an experiment to observe the migration of an electron hole across iodobenzene on the few-femtosecond timescale. We present

  14. Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10 nm half-pitch resolution region

    Science.gov (United States)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2017-01-01

    The development of lithography processes with sub-10 nm resolution is challenging. Stochastic phenomena such as line width roughness (LWR) are significant problems. In this study, the feasibility of sub-10 nm fabrication using chemically amplified extreme ultraviolet resists with photodecomposable quenchers was investigated from the viewpoint of the suppression of LWR. The relationship between sensitizer concentration (the sum of acid generator and photodecomposable quencher concentrations) and resist performance was clarified, using the simulation based on the sensitization and reaction mechanisms of chemically amplified resists. For the total sensitizer concentration of 0.5 nm-3 and the effective reaction radius for the deprotection of 0.1 nm, the reachable half-pitch while maintaining 10% critical dimension (CD) LWR was 11 nm. The reachable half-pitch was 7 nm for 20% CD LWR. The increase in the effective reaction radius is required to realize the sub-10 nm fabrication with 10% CD LWR.

  15. Elongation of extreme ultraviolet (at 13.5 nm) emission with time-of-flight controlled discharges and lateral fuel injection

    Science.gov (United States)

    Hosokai, Tomonao; Yokoyama, Takuma; Zhidkov, Alexei; Sato, Hiroto; Hotta, Eiki; Horioka, Kazuhiko

    2008-09-01

    A way toward a quasicontinuous extreme ultraviolet (EUV) radiation source is proposed and explored. Tin and lithium vapor discharges with the lateral laser-ablation injection are experimentally studied as possible efficient sources of quasicontinuous emission of EUV radiation at a wavelength of 13.5 nm. It is shown that the time-of-flight control of optimal plasma parameters by means of varying ablating laser pulse parameters provides a considerable elongation of maximal-power EUV emission with an overall efficiency of 0.1% and with an energy output exceeding 1% of the energy deposited in the discharge plasma. Along with a high average power and a stable position, such an emitter may have its size small enough to be used in the projection lithography.

  16. Harmonium: A pulse preserving source of monochromatic extreme ultraviolet (30–110 eV radiation for ultrafast photoelectron spectroscopy of liquids

    Directory of Open Access Journals (Sweden)

    J. Ojeda

    2016-03-01

    Full Text Available A tuneable repetition rate extreme ultraviolet source (Harmonium for time resolved photoelectron spectroscopy of liquids is presented. High harmonic generation produces 30–110 eV photons, with fluxes ranging from ∼2 × 1011 photons/s at 36 eV to ∼2 × 108 photons/s at 100 eV. Four different gratings in a time-preserving grating monochromator provide either high energy resolution (0.2 eV or high temporal resolution (40 fs between 30 and 110 eV. Laser assisted photoemission was used to measure the temporal response of the system. Vibrational progressions in gas phase water were measured demonstrating the ∼0.2 eV energy resolution.

  17. First observation of natural circular dichroism spectra in the extreme ultraviolet region using a polarizing undulator-based optical system and its polarization characteristics.

    Science.gov (United States)

    Tanaka, Masahito; Yagi-Watanabe, Kazutoshi; Kaneko, Fusae; Nakagawa, Kazumichi

    2009-07-01

    Natural circular dichroism (CD) spectra in the extreme ultraviolet (EUV) region down to a wavelength of 80 nm have been observed for the first time, using an alanine thin film deposited on sodium salicylate coated glass as a sample. Calibrated EUV-CD spectra of L-alanine exhibited a large negative peak at around 120 nm and a positive CD signal below 90 nm, which were roughly predicted by theoretical calculations. A CD measurement system with an Onuki-type polarizing undulator was used to obtain the EUV-CD spectra. This CD system, the development of which took five years, can be used to observe even weak natural CD spectra. The polarization characteristics of this system were also evaluated in order to calibrate the recorded CD spectra.

  18. Far-infrared-light shadowgraphy for high extraction efficiency of extreme ultraviolet light from a CO2-laser-generated tin plasma

    Science.gov (United States)

    Matsukuma, Hiraku; Hosoda, Tatsuya; Suzuki, Yosuke; Yogo, Akifumi; Yanagida, Tatsuya; Kodama, Takeshi; Nishimura, Hiroaki

    2016-08-01

    The two-color, double-pulse method is an efficient scheme to generate extreme ultraviolet light for fabricating the next generation semiconductor microchips. In this method, a Nd:YAG laser pulse is used to expand a several-tens-of-micrometers-scale tin droplet, and a CO2 laser pulse is subsequently directed at the expanded tin vapor after an appropriate delay time. We propose the use of shadowgraphy with a CO2 laser probe-pulse scheme to optimize the CO2 main-drive laser. The distribution of absorption coefficients is derived from the experiment, and the results are converted to a practical absorption rate for the CO2 main-drive laser.

  19. Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography

    Science.gov (United States)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2016-09-01

    The resolution of resist processes for extreme ultraviolet (EUV) lithography has been steadily improved and has reached the sub-20 nm half-pitch region. Currently, the resist materials capable of resolving 11 nm half-pitch line-and-space patterns are being developed in industrial fields. In this study, the line-and-space resist patterns with sub-20 nm half-pitches were fabricated using a high-numerical-aperture (NA) EUV exposure tool and analyzed by the Monte Carlo simulation. The scanning electron microscopy (SEM) images of resist patterns after their development were compared with the latent images calculated on the basis of the sensitization and reaction mechanisms of chemically amplified EUV resists. The approximate relationship between resist patterns and latent images was clarified for the sub-20 nm half-pitch region. For the realization of 11 nm half-pitch fabrication, the suppression of the stochastic effects in the development process is an important consideration.

  20. Probing attosecond pulse structures by XUV-induced hole dynamics

    CERN Document Server

    You, Jhih-An; Dahlström, Jan Marcus

    2015-01-01

    We investigate a two-photon ionization process in neon by an isolated attosecond pump pulse and two coherent extreme ultraviolet probe fields. The probe fields, tuned to the 2s-2p transition in the residual ion, allow for coherent control of the photoelectron via indirect interactions with the hole. We show that the photoelectron-ion coincidence signal contains an interference pattern that can be used to reconstruct the temporal structure of attosecond pump pulses. Our results are supported by simulations based on time-dependent configuration-interaction singles and lowest-order perturbation theory within second quantization.

  1. Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

    CERN Document Server

    Dolgov, A; Abrikosov, A; Snegirev, E; Krivtsun, V M; Lee, C J; Bijkerk, F

    2014-01-01

    An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.

  2. Dissociative photoionization of molecular hydrogen. A joint experimental and theoretical study of the electron-electron correlations induced by XUV photoionization and nuclear dynamics on IR-laser dressed transition states

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, Andreas

    2015-01-13

    In this thesis, the dissociative single-ionization of molecular hydrogen is investigated in a kinematically complete experiment by employing extreme ultraviolet attosecond pulse trains and infrared femtosecond laser pulses. Induced by the absorption of a single XUV photon, a pronounced energy-dependent asymmetry of the relative emission direction of the photoelectron and the ion is observed. The asymmetry pattern is explained in terms of an interference of two ionization pathways involving a doubly-excited state. This interpretation is validated by a semi-classical model which only takes the nuclear motion into account. Using this model and the observed asymmetry, it is furthermore possible to disentangle the two dissociation pathways which allows for the determination of the autoionization lifetime of the contributing doubly-excited state as a function of the internuclear distance. Moreover, using a pump-probe experiment the dissociation dynamics of molecular hydrogen is investigated. A time-delay dependent momentum distribution of the fragments is observed. With a combined quantum mechanical and semi-classical approach the mechanism giving rise to the observed time-dependence is identified in terms of an intuitive elevator mechanism.

  3. XUV-exposed, non-hydrostatic hydrogen-rich upper atmospheres of terrestrial planets. Part I: atmospheric expansion and thermal escape.

    Science.gov (United States)

    Erkaev, Nikolai V; Lammer, Helmut; Odert, Petra; Kulikov, Yuri N; Kislyakova, Kristina G; Khodachenko, Maxim L; Güdel, Manuel; Hanslmeier, Arnold; Biernat, Helfried

    2013-11-01

    The recently discovered low-density "super-Earths" Kepler-11b, Kepler-11f, Kepler-11d, Kepler-11e, and planets such as GJ 1214b represent the most likely known planets that are surrounded by dense H/He envelopes or contain deep H₂O oceans also surrounded by dense hydrogen envelopes. Although these super-Earths are orbiting relatively close to their host stars, they have not lost their captured nebula-based hydrogen-rich or degassed volatile-rich steam protoatmospheres. Thus, it is interesting to estimate the maximum possible amount of atmospheric hydrogen loss from a terrestrial planet orbiting within the habitable zone of late main sequence host stars. For studying the thermosphere structure and escape, we apply a 1-D hydrodynamic upper atmosphere model that solves the equations of mass, momentum, and energy conservation for a planet with the mass and size of Earth and for a super-Earth with a size of 2 R(Earth) and a mass of 10 M(Earth). We calculate volume heating rates by the stellar soft X-ray and extreme ultraviolet radiation (XUV) and expansion of the upper atmosphere, its temperature, density, and velocity structure and related thermal escape rates during the planet's lifetime. Moreover, we investigate under which conditions both planets enter the blow-off escape regime and may therefore experience loss rates that are close to the energy-limited escape. Finally, we discuss the results in the context of atmospheric evolution and implications for habitability of terrestrial planets in general.

  4. Reply to “Comment on ‘Ultrafast Demagnetization Measurements Using Extreme Ultraviolet Light: Comparison of Electronic and Magnetic Contributions’ ”

    Directory of Open Access Journals (Sweden)

    Emrah Turgut

    2013-09-01

    Full Text Available In the following, we show that the conclusions of our article titled “Ultrafast Demagnetization Measurements Using Extreme Ultraviolet Light: Comparison of Electronic and Magnetic Contributions” are correct. The Comment of Vodungbo et al. argues that a unique determination of the refractive index variation over time is not possible using the data set presented in our paper. Furthermore, it was suggested that the lack of uniqueness allows for the possibility of a very specific time-dependent trajectory of the refractive index in the complex plane that could give rise to a large nonmagnetic modulation of the measured asymmetry, in spite of a negligible change in the s-polarized reflectivity. In this Reply, we conclusively show that any nonmagnetic contribution to the measured asymmetry is indeed negligible (<2%, below the noise level of the magnetic-asymmetry measurements. First, we use a few additional measurements to unambiguously rule out the presence of any nonmagnetic contributions to the signal. Second, we show that the scenario proposed by Vodungbo et al. would require both exotic time and energy dependences of the refractive index near the M edge that are extremely unlikely (virtually impossible in real materials. Thus, the conclusions of our original article are preserved.

  5. First measurements of highly ionized impurity emission distribution by grazing-incidence flat-field extreme ultraviolet spectrometer in HL-2A.

    Science.gov (United States)

    Cui, Zhengying; Dong, Chunfeng; Zhou, Hangyu; Morita, Shigeru; Sun, Ping; Fu, Bingzhong; Lu, Ping; Ding, Xuantong; Yang, Qingwei; Duan, Xuru

    2014-11-01

    A space-resolved grazing-incidence flat-field extreme ultraviolet (EUV) spectrometer has been developed in the HL-2A tokamak to measure vertical impurity emission profiles with simultaneous spectral, temporal, and spatial resolution. The spectrometer working in the wavelength range of 30-500 Å has been equipped with a gold-coated varied-line-spacing holographic grating with curvature of 5606 mm and a back illuminated charge-coupled device with size of 6.6 × 26.6 mm(2) (255 × 1024 pixels). A lower half of the HL-2A plasma with averaged minor radius of 40 cm is observed when the spectrometer with horizontal dispersion is placed at a distance of 7.5 m away from the plasma center. An excellent spatial resolution of 12 mm is achieved when a space-resolved slit with vertical width of 0.5 mm is adopted. The radial profiles of intrinsic impurities in several ionization stages have been measured with high throughput and extremely low stray light.

  6. Influence of the metallic contact in extreme-ultraviolet and soft x-ray diamond based Schottky photodiodes

    Science.gov (United States)

    Ciancaglioni, I.; Di Venanzio, C.; Marinelli, Marco; Milani, E.; Prestopino, G.; Verona, C.; Verona-Rinati, G.; Angelone, M.; Pillon, M.; Tartoni, N.

    2011-09-01

    X-ray and UV photovoltaic Schottky photodiodes based on single crystal diamond were recently developed at Rome "Tor Vergata" University laboratories. In this work, different rectifying metallic contact materials were thermally evaporated on the oxidized surface of intrinsic single crystal diamond grown by chemical vapor deposition. Their impact on the detection performance in the extreme UV and soft x-ray spectral regions was studied. The electrical characterization of the metal/diamond Schottky junctions was performed at room temperature by measuring the capacitance-voltage characteristics. The diamond photodiodes were then tested both over the extreme UV spectral region from 10 to 60 eV by using He-Ne DC gas discharge as a radiation source and toroidal vacuum monochromator, and in the soft x-ray range from 6 to 20 keV at the Diamond Light Source synchrotron x-ray beam-line in Harwell (UK). In both experimental setups, time response and spectral responsivity were analyzed for all the investigated Schottky contact materials. A good agreement between the experimental data and theoretical results from Monte Carlo simulations is found

  7. Coherent XUV generation driven by sharp metal tips photoemission

    CERN Document Server

    Ciappina, M F; Shaaran, T; Lewenstein, M

    2014-01-01

    It was already experimentally demonstrated that high-energy electrons can be generated using metal nanotips as active media. In addition, it has been theoretically proven that the high-energy tail of the photoemitted electrons is intrinsically linked to the recollision phenomenon. Through this recollision process it is also possible to convert the energy gained by the laser-emitted electron in the continuum in a coherent XUV photon. It means the emission of harmonic radiation appears to be feasible, although it has not been experimentally demonstrated hitherto till now. In this paper, we employ a quantum mechanical approach to model the electron dipole moment including both the laser experimental conditions and the bulk matter properties and predict is possible to generate coherent UV and XUV radiation using metal nanotips as sources. Our quantum mechanical results are fully supported by their classical counterparts.

  8. Extreme Ultraviolet Variability Experiment (EVE) on the Solar Dynamics Observatory (SDO): Overview of Science Objectives, Instrument Design, Data Products, and Model Developments

    Science.gov (United States)

    Woods, T. N.; Eparvier, F. G.; Hock, R.; Jones, A. R.; Woodraska, D.; Judge, D.; Didkovsky, L.; Lean, J.; Mariska, J.; Warren, H.; McMullin, D.; Chamberlin, P.; Berthiaume, G.; Bailey, S.; Fuller-Rowell, T.; Sojka, J.; Tobiska, W. K.; Viereck, R.

    2010-01-01

    The highly variable solar extreme ultraviolet (EUV) radiation is the major energy input to the Earth's upper atmosphere, strongly impacting the geospace environment, affecting satellite operations, communications, and navigation. The Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO) will measure the solar EUV irradiance from 0.1 to 105 nm with unprecedented spectral resolution (0.1 nm), temporal cadence (ten seconds), and accuracy (20%). EVE includes several irradiance instruments: The Multiple EUV Grating Spectrographs (MEGS)-A is a grazingincidence spectrograph that measures the solar EUV irradiance in the 5 to 37 nm range with 0.1-nm resolution, and the MEGS-B is a normal-incidence, dual-pass spectrograph that measures the solar EUV irradiance in the 35 to 105 nm range with 0.1-nm resolution. To provide MEGS in-flight calibration, the EUV SpectroPhotometer (ESP) measures the solar EUV irradiance in broadbands between 0.1 and 39 nm, and a MEGS-Photometer measures the Sun s bright hydrogen emission at 121.6 nm. The EVE data products include a near real-time space-weather product (Level 0C), which provides the solar EUV irradiance in specific bands and also spectra in 0.1-nm intervals with a cadence of one minute and with a time delay of less than 15 minutes. The EVE higher-level products are Level 2 with the solar EUV irradiance at higher time cadence (0.25 seconds for photometers and ten seconds for spectrographs) and Level 3 with averages of the solar irradiance over a day and over each one-hour period. The EVE team also plans to advance existing models of solar EUV irradiance and to operationally use the EVE measurements in models of Earth s ionosphere and thermosphere. Improved understanding of the evolution of solar flares and extending the various models to incorporate solar flare events are high priorities for the EVE team.

  9. On the maximum conversion efficiency into the 13.5-nm extreme ultraviolet emission under a steady-state laser ablation of tin microspheres

    Science.gov (United States)

    Basko, M. M.

    2016-08-01

    Theoretical investigation has been performed on the conversion efficiency (CE) into the 13.5-nm extreme ultraviolet (EUV) radiation in a scheme where spherical microspheres of tin (Sn) are simultaneously irradiated by two laser pulses with substantially different wavelengths. The low-intensity short-wavelength pulse is used to control the rate of mass ablation and the size of the EUV source, while the high-intensity long-wavelength pulse provides efficient generation of the EUV light at λ=13.5 nm. The problem of full optimization for maximizing the CE is formulated and solved numerically by performing two-dimensional radiation-hydrodynamics simulations with the RALEF-2D code under the conditions of steady-state laser illumination. It is shown that, within the implemented theoretical model, steady-state CE values approaching 9% are feasible; in a transient peak, the maximum instantaneous CE of 11.5% was calculated for the optimized laser-target configuration. The physical factors, bringing down the fully optimized steady-state CE to about one half of the absolute theoretical maximum of CE≈20 % for the uniform static Sn plasma, are analyzed in detail.

  10. A Partnership between English Language Learners and a Team of Rocket Scientists: EPO for the NASA SDO Extreme Ultraviolet Variability Experiment (EVE)

    Science.gov (United States)

    Buhr, S. M.; McCaffrey, M. S.; Eparvier, F.; Murillo, M.

    2008-05-01

    Recent immigrant high school students were successfully engaged in learning about Sun-Earth connections through a partnership with the NASA Solar Dynamics Observatory Extreme Ultraviolet Variability Experiment (EVE) project. The students were enrolled in a pilot course as part of the Math, Engineering and Science Achievement (MESA) program. The English Language Learner (ELL) students doubled their achievement on a pre- and post- assessment on the content of the course. Students learned scientific content and vocabulary in English with support in Spanish, attended field trips, hosted scientist speakers, built antenna and deployed space weather monitors as part of the Stanford SOLAR project, and gave final presentations in English, showcasing their new computer skills. Teachers who taught the students in other courses noted gains in the students' willingness to use English in class and noted gains in math skills. The course has been broken into modules for use in shorter after-school environments, or for use by EVE scientists who are outside of the Boulder area. Video footage of "The Making of a Satellite", and "All About EVE" is completed for use in the kits. Other EVE EPO includes upcoming professional development for teachers and content workshops for journalists.

  11. A Partnership between English Language Learners and a Team of Rocket Scientists: EPO for the NASA SDO Extreme-Ultraviolet Variability Experiment (EVE)

    Science.gov (United States)

    Buhr, S. M.; Eparvier, F.; McCaffrey, M.; Murillo, M.

    2007-12-01

    Recent immigrant high school students were successfully engaged in learning about Sun-Earth connections through a partnership with the NASA SDO Extreme-Ultraviolet Variability Experiment (EVE) project. The students were enrolled in a pilot course as part of the Math, Engineering and Science Achievement MESA) program. For many of the students, this was the only science option available to them due to language limitations. The English Language Learner (ELL) students doubled their achievement on a pre- and post-assessment on the content of the course. Students learned scientific content and vocabulary in English with support in Spanish, attended field trips, hosted scientist speakers, built and deployed space weather monitors as part of the Stanford SOLAR project, and gave final presentations in English, showcasing their new computer skills. Teachers who taught the students in other courses noted gains in the students' willingness to use English in class and noted gains in math skills. The MESA-EVE course won recognition as a Colorado MESA Program of Excellence and is being offered again in 2007-08. The course has been broken into modules for use in shorter after-school environments, or for use by EVE scientists who are outside of the Boulder area. Other EVE EPO includes professional development for teachers and content workshops for journalists.

  12. Attenuation from the optical to the extreme ultraviolet by dust associated with broad absorption line quasars: the driving force for outflows

    CERN Document Server

    Gaskell, C Martin; Singh, Japneet

    2016-01-01

    We use mid-IR to UV observations to derive a mean attenuation curve out to the rest-frame extreme ultraviolet (EUV) for "BAL dust" -- the dust causing the additional extinction of active galactic nuclei (AGNs) with broad absorption lines (BALQSOs). In contrast to the normal, relatively flat, mean AGN attenuation curve, BAL dust is well fit by a steeply rising, SMC-like curve. We confirm the shape of the theoretical Weingartner & Draine SMC curve out to 700 \\AA, but the drop in attenuation at still shorter wavelengths is less than predicted. The identical attenuation curve for low-ionization BALQSOs (LoBALs) does not support them being a "break out" phase in the life of AGNs. Although attenuation in the optical due to BAL dust is low ($E(B-V) \\sim 0.03 - 0.05$), the attenuation rises to one magnitude in the EUV because of the steep extinction curve. Here the dust optical depth is at the optimum value for radiative acceleration of dusty gas. Because the spectral energy distribution of AGNs peaks in the EUV ...

  13. Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system

    Science.gov (United States)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

    2016-05-01

    Extreme ultraviolet lithography (EUVL) is a promising technique for 1X nm half-pitch (hp) generation lithography. The inspection of patterned EUVL masks is one of the main issues that must be addressed during mask fabrication for manufacture of devices with 11 nm hp feature sizes. We have already designed projection electron microscope (PEM) optics that have been integrated into a new inspection system called Model EBEYE-V30 (where "Model EBEYE" is an EBARA's model code) and this system seems quite promising for 16 nm hp generation EUVL patterned mask inspection. The defect inspection sensitivity of this system was evaluated via capture of an electron image that was generated at the mask by focusing the image through the projection optics onto a time-delay integration (TDI) image sensor. For increased throughput and higher defect detection sensitivity, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and a simultaneous deflector for the image capture area that follows the mask scanning motion have been developed. Using a combination of synchronous deflection and mask scanning, the image can be integrated into both the fixed area image sensor and the TDI image sensor. We describe our experimental results for EUV patterned mask inspection using the above system. Elements have been developed for inspection tool integration and the designed specification has been verified. The system performance demonstrates the defect detectability required for 11 nm hp generation EUVL masks.

  14. Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems

    Energy Technology Data Exchange (ETDEWEB)

    Bartnik, A.; Wachulak, P.; Fok, T.; Węgrzyński, Ł.; Fiedorowicz, H. [Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw (Poland); Pisarczyk, T.; Chodukowski, T.; Kalinowska, Z. [Institute of Plasma Physics and Laser Microfusion, 23 Hery St., 00-908 Warsaw (Poland); Dudzak, R.; Dostal, J.; Krousky, E.; Skala, J.; Ullschmied, J.; Hrebicek, J.; Medrik, T. [Institute of Plasma Physics ASCR, Prague, Czech Republic and Institute of Physics ASCR, Prague (Czech Republic)

    2015-04-15

    A comparative study of photoionized plasmas created by two soft X-ray and extreme ultraviolet (SXR/EUV) laser plasma sources with different parameters is presented. The two sources are based on double-stream Xe/He gas-puff targets irradiated with high (500 J/0.3 ns) and low energy (10 J/1 ns) laser pulses. In both cases, the SXR/EUV beam irradiated the gas stream, injected into a vacuum chamber synchronously with the radiation pulse. Irradiation of gases resulted in formation of photoionized plasmas emitting radiation in the SXR/EUV range. The measured Ne plasma radiation spectra are dominated by emission lines corresponding to radiative transitions in singly charged ions. A significant difference concerns origin of the lines: K-shell or L-shell emissions occur in case of the high and low energy irradiating system, respectively. In high energy system, the electron density measurements were also performed by laser interferometry, employing a femtosecond laser system. A maximum electron density for Ne plasma reached the value of 2·10{sup 18 }cm{sup −3}. For the low energy system, a detection limit was too high for the interferometric measurements, thus only an upper estimation for electron density could be made.

  15. Effect of ultraviolet absorptivity and waterproofness of poly(3,4-ethylenedioxythiophene) with extremely weak acidity, high conductivity on enhanced stability of perovskite solar cells

    Science.gov (United States)

    Yu, Wei; Wang, Kaixuan; Guo, Bin; Qiu, Xueqing; Hao, Yue; Chang, JingJing; Li, Yuan

    2017-08-01

    The poor long-term stability of perovskite solar cells (PSCs) tremendously hampers their future commercialization though their superior photovoltaic efficiencies. To enhance the device stability, a new poly(3,4-ethylenedioxythiophene):sulfonated acetone-formaldehyde (PEDOT:SAF) with higher PEDOT content (2:1) is developed considering the excellent dispersing capacity of SAF. PEDOT:SAF exhibits extremely lower acidity with pH value of 6 and higher conductivity of 3.12 S/cm comparing with the former reported sample with lower PEDOT content. Moreover, PEDOT:SAF film shows superior ultraviolet (UV) absorptivity originated from the fluorescence effect of SAF and unexceptionable film waterproofness on account of the high PEDOT content. As a result, the PSC incorporating PEDOT:SAF as the hole extraction layer (HEL) achieves higher power conversion efficiency (PCE) and highly enhanced device stability than the traditional PEDOT:PSS-based device. After 28 days of storage time, our device retains 83.2% from its original PCE, while almost half-degradation is experienced in the PEDOT:PSS controlled device. In addition, SAF is renewable with more simple and inexpensive preparation than that of PSS. Undoubtedly, this new PEDOT:SAF provides us a scaffold for designing stable PSC, and this platform is also shared in other photovoltaic technologies.

  16. High-order nonlinear optical processes in ablated carbon-containing materials: Recent approaches in development of the nonlinear spectroscopy using harmonic generation in the extreme ultraviolet range

    Science.gov (United States)

    Ganeev, R. A.

    2017-08-01

    The nonlinear spectroscopy using harmonic generation in the extreme ultraviolet range became a versatile tool for the analysis of the optical, structural and morphological properties of matter. The carbon-contained materials have shown the advanced properties among other studied species, which allowed both the definition of the role of structural properties on the nonlinear optical response and the analysis of the fundamental features of carbon as the attractive material for generation of coherent short-wavelength radiation. We review the studies of the high-order harmonic generation by focusing ultrashort pulses into the plasmas produced during laser ablation of various organic compounds. We discuss the role of ionic transitions of ablated carbon-containing molecules on the harmonic yield. We also show the similarities and distinctions of the harmonic and plasma spectra of organic compounds and graphite. We discuss the studies of the generation of harmonics up to the 27th order (λ = 29.9 nm) of 806 nm radiation in the boron carbide plasma and analyze the advantages and disadvantages of this target compared with the ingredients comprising B4C (solid boron and graphite) by comparing plasma emission and harmonic spectra from three species. We also show that the coincidence of harmonic and plasma emission wavelengths in most cases does not cause the enhancement or decrease of the conversion efficiency of this harmonic.

  17. High brightness extreme ultraviolet (at 13.5 nm) emission from time-of-flight controlled discharges with coaxial fuel injection

    Science.gov (United States)

    Hosokai, Tomonao; Yokoyama, Takuma; Zhidkov, Alexei; Sato, Hiroto; Horioka, Kazuhiko; Hotta, Eiki

    2008-09-01

    Extreme ultraviolet (EUV) emission from discharge produced plasma with the coaxial injection of fuel vapor (tin and lithium) produced by laser ablation is experimentally studied. Multiple plasma pinches preceding a strong and long recombination radiation of EUV are observed in the first half cycle of a sinusoidal discharge current. Due to the time-of-flight control type of the discharge, the shape of pinch radiation pulses is almost identical. With the coaxial injection of time-of-flight controlled discharges, the highest brightness of EUV emission (maximum extracted energy of 244.3 mJ/2π sr per pulse with the emitter size of ˜1×0.3 mm2 in full width at half maximum) is provided with efficiency exceeding 2% of deposited energy into the plasma (or 1% of dissipated energy in the discharge) due to a much better matching with the optimal plasma parameters in the recombination regime and a decrease in the off-duty factor. Stability of emitting plasma of the repetitive pinches is essentially improved with use of a second laser pulse.

  18. High-resolution extreme ultraviolet spectroscopy of G191-B2B: structure of the stellar photosphere and the surrounding interstellar medium

    Science.gov (United States)

    Barstow, M. A.; Cruddace, R. G.; Kowalski, M. P.; Bannister, N. P.; Yentis, D.; Lapington, J. S.; Tandy, J. A.; Hubeny, I.; Schuh, S.; Dreizler, S.; Barbee, T. W.

    2005-10-01

    We have continued our detailed analysis of the high-resolution (R= 4000) spectroscopic observation of the DA white dwarf G191-B2B, obtained by the Joint Astrophysical Plasmadynamic Experiment (J-PEX) normal incidence sounding rocket-borne telescope, comparing the observed data with theoretical predictions for both homogeneous and stratified atmosphere structures. We find that the former models give the best agreement over the narrow waveband covered by J-PEX, in conflict with what is expected from previous studies of the lower resolution but broader wavelength coverage Extreme Ultraviolet Explorer spectra. We discuss the possible limitations of the atomic data and our understanding of the stellar atmospheres that might give rise to this inconsistency. In our earlier study, we obtained an unusually high ionization fraction for the ionized HeII present along the line of sight to the star. In the present paper, we obtain a better fit when we assume, as suggested by Space Telescope Imaging Spectrograph results, that this HeII resides in two separate components. When one of these is assigned to the local interstellar cloud, the implied He ionization fraction is consistent with measurements along other lines of sight. However, the resolving power and signal-to-noise available from the instrument configuration used in this first successful J-PEX flight are not sufficient to clearly identify and prove the existence of the two components.

  19. Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system.

    Science.gov (United States)

    Nowak, Krzysztof M; Ohta, Takeshi; Suganuma, Takashi; Yokotsuka, Toshio; Fujimoto, Junichi; Mizoguchi, Hakaru

    2012-12-01

    Quantum cascade laser (QCL) is a very attractive seed source for a multikilowatt pulsed CO2 lasers applied for driving extreme ultraviolet emitting plasmas. In this Letter, we investigate output beam properties of a QCL designed to address P18 and P20 lines of 10.6 micron band of CO2 molecule. In particular, output beam quality and stability are investigated for the first time. A well-defined linear polarization and a single-mode operation enabled a use of phase retrieval method for full description of QCL output beam. A direct, multi-image numerical phase retrieval technique was developed and successfully applied to the measured intensity patterns of a QCL beam. Very good agreement between the measured and reconstructed beam profiles was observed at distances ranging from QCL aperture to infinity, proving a good understanding of the beam propagation. The results also confirm a high spatial coherence and high stability of the beam parameters, the features expected from an excellent seed source.

  20. Alignment and characterization of the two-stage time delay compensating XUV monochromator

    CERN Document Server

    Eckstein, Martin; Kubin, Markus; Yang, Chung-Hsin; Frassetto, Fabio; Poletto, Luca; Vrakking, Marc J J; Kornilov, Oleg

    2016-01-01

    We present the design, implementation and alignment procedure for a two-stage time delay compensating monochromator. The setup spectrally filters the radiation of a high-order harmonic generation source providing wavelength-selected XUV pulses with a bandwidth of 300 to 600~meV in the photon energy range of 3 to 50~eV. XUV pulses as short as $12\\pm3$~fs are demonstrated. Transmission of the 400~nm (3.1~eV) light facilitates precise alignment of the monochromator. This alignment strategy together with the stable mechanical design of the motorized beamline components enables us to automatically scan the XUV photon energ in pump-probe experiments that require XUV beam pointing stability. The performance of the beamline is demonstrated by the generation of IR-assisted sidebands in XUV photoionization of argon atoms.

  1. Design of Optical System for Solar Extreme-Ultraviolet Imaging Spectrometer%太阳极紫外成像光谱仪光学系统设计

    Institute of Scientific and Technical Information of China (English)

    刘壮; 巩岩

    2012-01-01

    Hyper-spectral imaging observation of the sun in the EUV region is an important method of research for solar's upper transition region, corona and plasma's physical property. Based on the application objective of solar extreme ultraviolet imaging spectrometer(SEUlS), combined with the current states of domestic and foreign extreme ultraviolet imaging spectrometer, a few of parameters for SEUIS design were drew up in the present paper. The advantages and disadvantages of all kinds of optical configurations were discussed,and the configuration of combination of telescope and spectrometer was chosen. The available main components were also described, off-axis parabolic mirror was chosen for telescope, and a high density uniform-line-space toroidal grating for dispersion device. The optical system which satisfies the performance parameters was designed The design process, detailed parameters and results were presented in the end. The working wavelength of the optics system is 17. 0~21. 0 nm, the field of view is 1 228"×1 024", the spatial resolution is 0. 8 arc sec ? Pixel-1, the spectral resolution is about 0. 00198 nm ? Pixel-1, and the total length of system is about 2.8m.%在极紫外波段对太阳进行超光谱成像观测是研究太阳上层大气,日冕中等离子物理特性的重要手段.依据太阳极紫外成像光谱仪的应用,结合国内外极紫外成像光谱仪发展现状,制定了太阳极紫外成像光谱仪的性能指标.通过比较各种光学结构的优缺点,选择望远镜与光谱仪组合的结构.讨论并选择了可用的基本元器件,望远系统采用离轴抛物面反射镜,分光器件为高密度超环面等间距光栅.设计出符合指标的光学系统.最后给出了太阳极紫外成像光谱仪的设计过程、详细参数与结果.光学系统的工作波段为17.0~21.0nm,视场是1228″×1024″,空间分辨率达到0.8 arcsec·pixel-1,光谱分辨率约为0.001 98 nm·pixel-1,系统总长度约为2.8m.

  2. Initiation and Early Evolution of the Coronal Mass Ejection on 2009 May 13 from Extreme-ultraviolet and White-light Observations

    Science.gov (United States)

    Reva, A. A.; Ulyanov, A. S.; Bogachev, S. A.; Kuzin, S. V.

    2014-10-01

    We present the results of the observations of a coronal mass ejection (CME) that occurred on 2009 May 13. The most important feature of these observations is that the CME was observed from the very early stage (the solar surface) up to a distance of 15 solar radii (R ⊙). Below 2 R ⊙, we used the data from the TESIS extreme-ultraviolet telescopes obtained in the Fe 171 Å and He 304 Å lines, and above 2 R ⊙, we used the observations of the LASCO C2 and C3 coronagraphs. The CME was formed at a distance of 0.2-0.5R ⊙ from the Sun's surface as a U-shaped structure, which was observed both in the 171 Å images and in the white light. Observations in the He 304 Å line showed that the CME was associated with an erupting prominence, which was not located above—as the standard model predicts—but rather in the lowest part of the U-shaped structure close to the magnetic X point. The prominence location can be explained with the CME breakout model. Estimates showed that CME mass increased with time. The CME trajectory was curved—its heliolatitude decreased with time. The CME started at a latitude of 50° and reached the ecliptic plane at distances of 2.5 R ⊙. The CME kinematics can be divided into three phases: initial acceleration, main acceleration, and propagation with constant velocity. After the CME, onset GOES registered a sub-A-class flare.

  3. Initiation and early evolution of the coronal mass ejection on 2009 May 13 from extreme-ultraviolet and white-light observations

    Energy Technology Data Exchange (ETDEWEB)

    Reva, A. A.; Ulyanov, A. S.; Bogachev, S. A.; Kuzin, S. V., E-mail: reva.antoine@gmail.com [Lebedev Physical Institute, Russian Academy of Sciences, 53 Leninskij Prospekt, 119991 Moscow (Russian Federation)

    2014-10-01

    We present the results of the observations of a coronal mass ejection (CME) that occurred on 2009 May 13. The most important feature of these observations is that the CME was observed from the very early stage (the solar surface) up to a distance of 15 solar radii (R {sub ☉}). Below 2 R {sub ☉}, we used the data from the TESIS extreme-ultraviolet telescopes obtained in the Fe 171 Å and He 304 Å lines, and above 2 R {sub ☉}, we used the observations of the LASCO C2 and C3 coronagraphs. The CME was formed at a distance of 0.2-0.5R {sub ☉} from the Sun's surface as a U-shaped structure, which was observed both in the 171 Å images and in the white light. Observations in the He 304 Å line showed that the CME was associated with an erupting prominence, which was not located above—as the standard model predicts—but rather in the lowest part of the U-shaped structure close to the magnetic X point. The prominence location can be explained with the CME breakout model. Estimates showed that CME mass increased with time. The CME trajectory was curved—its heliolatitude decreased with time. The CME started at a latitude of 50° and reached the ecliptic plane at distances of 2.5 R {sub ☉}. The CME kinematics can be divided into three phases: initial acceleration, main acceleration, and propagation with constant velocity. After the CME, onset GOES registered a sub-A-class flare.

  4. Tailoring of XUV supercontinua through coherent control of high-order harmonic generation

    CERN Document Server

    Holgado, W; Alonso, B; Miranda, M; Silva, F; Plaja, L; Crespo, H; Sola, I J

    2016-01-01

    We present observations of the emission of XUV supercontinua in the 20-37 eV region by high harmonic generation (HHG) with 4-7 fs pulses focused onto a Kr gas jet. The underlying mechanism relies on coherent control of the relative delays and phases between individually generated attosecond pulses, achievable by adjusting the chirp of the driving pulses and the interaction geometry. Under adequate chirp and phase matching conditions the resulting interference will yield a supercontinuum XUV spectrum. This technique opens the route for modifying the phase of individual attosecond pulses and for the coherent synthesis of XUV supercontinua without the need of an isolated attosecond burst.

  5. An ultrastable Michelson interferometer for high-resolution spectroscopy in the XUV.

    Science.gov (United States)

    Corsi, C; Liontos, I; Cavalieri, S; Bellini, M; Venturi, G; Eramo, R

    2015-02-23

    We developed an ultra-stable and accurately-controllable Michelson interferometer to be used in a deeply unbalanced arm configuration for split-pulse XUV Ramsey-type spectroscopy with high-order laser harmonics. The implemented active and passive stabilization systems allow one to reach instabilities in the nanometer range over meters of relative optical path differences. Producing precisely delayed pairs of pump pulses will generate XUV harmonic pulses that may significantly improve the achievable spectral resolution and the precision of absolute frequency measurements in the XUV.

  6. Time-resolved study of the extreme-ultraviolet emission and plasma dynamics of a sub-Joule, fast capillary discharge

    Energy Technology Data Exchange (ETDEWEB)

    Valenzuela, J. C., E-mail: jcval@ucsd.edu [Instituto de Físca, Pontificia Universidad Católica de Chile, Santiago (Chile); Instituto de Física, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Macul, Santiago (Chile); Wyndham, E. S.; Favre, M. [Instituto de Física, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Macul, Santiago (Chile)

    2015-08-15

    In this work, we discuss experimental observations on the dynamics of a fast, low energy capillary discharge when operated in argon and its properties as an intense source of extreme-ultraviolet (EUV) radiation. The discharge pre-ionization and self-triggering were accomplished by the use of the hollow cathode effect. This allowed a compact size and low inductance discharge with multi-kA current level and a quarter-period of ∼10 ns at sub-Joule energy level. We used the novel moiré and schlieren diagnostics with a 12 ps laser to obtain the time evolution of the line electron density and to study the plasma dynamics. EUV spectroscopy and filtered diodes were also implemented to estimate the plasma temperature and density throughout the evolution of the discharge. EUV source size was measured by using a filtered slit-wire camera. We observed that EUV emission starts from a compressed plasma on axis during the second quarter-period of the current and continues until the fifth quarter-period. Ionization levels from Ar VII to X were observed. By comparing the EUV emission spectra with synthetic spectra, we found that at the onset of emission (∼7 ns), the plasma is well fitted by a single Maxwellian electron distribution function with T{sub e} ∼ 12 eV and n{sub e} ∼ 10{sup 17 }cm{sup −3}. Close to peak emission (∼13 ns), plasma temperature and density increase to ∼20 eV and n{sub e} ∼ 10{sup 18 }cm{sup −3}, respectively. However, in order to successfully match the experimental data, a two component electron distribution function was necessary. Later in time, a smaller fraction in the high energy component and higher temperature suggests homogenization of the plasma. The moiré and schlieren diagnostics showed multiple radial compression-waves merging on axis throughout the discharge; they are an important heating mechanism that leads to a period of severe turbulence at peak EUV emission. It was also observed that emission

  7. Time-resolved study of the extreme-ultraviolet emission and plasma dynamics of a sub-Joule, fast capillary discharge

    Science.gov (United States)

    Valenzuela, J. C.; Wyndham, E. S.; Favre, M.

    2015-08-01

    In this work, we discuss experimental observations on the dynamics of a fast, low energy capillary discharge when operated in argon and its properties as an intense source of extreme-ultraviolet (EUV) radiation. The discharge pre-ionization and self-triggering were accomplished by the use of the hollow cathode effect. This allowed a compact size and low inductance discharge with multi-kA current level and a quarter-period of ˜10 ns at sub-Joule energy level. We used the novel moiré and schlieren diagnostics with a 12 ps laser to obtain the time evolution of the line electron density and to study the plasma dynamics. EUV spectroscopy and filtered diodes were also implemented to estimate the plasma temperature and density throughout the evolution of the discharge. EUV source size was measured by using a filtered slit-wire camera. We observed that EUV emission starts from a compressed plasma on axis during the second quarter-period of the current and continues until the fifth quarter-period. Ionization levels from Ar VII to X were observed. By comparing the EUV emission spectra with synthetic spectra, we found that at the onset of emission (˜7 ns), the plasma is well fitted by a single Maxwellian electron distribution function with Te ˜ 12 eV and ne ˜ 1017 cm-3. Close to peak emission (˜13 ns), plasma temperature and density increase to ˜20 eV and ne ˜ 1018 cm-3, respectively. However, in order to successfully match the experimental data, a two component electron distribution function was necessary. Later in time, a smaller fraction in the high energy component and higher temperature suggests homogenization of the plasma. The moiré and schlieren diagnostics showed multiple radial compression-waves merging on axis throughout the discharge; they are an important heating mechanism that leads to a period of severe turbulence at peak EUV emission. It was also observed that emission ceases when the axial maximum of the electron density collapses.

  8. XUV-driven mass loss from extrasolar giant planets orbiting active stars

    CERN Document Server

    Chadney, J M; Unruh, Y C; Koskinen, T T; Sanz-Forcada, J

    2014-01-01

    Upper atmospheres of Hot Jupiters are subject to extreme radiation conditions that can result in rapid atmospheric escape. The composition and structure of the upper atmospheres of these planets are affected by the high-energy spectrum of the host star. This emission depends on stellar type and age, which are thus important factors in understanding the behaviour of exoplanetary atmospheres. In this study, we focus on Extrasolar Giant Planets (EPGs) orbiting K and M dwarf stars. XUV spectra for three different stars - epsilon Eridani, AD Leonis and AU Microscopii - are constructed using a coronal model. Neutral density and temperature profiles in the upper atmosphere of hypothetical EGPs orbiting these stars are then obtained from a fluid model, incorporating atmospheric chemistry and taking atmospheric escape into account. We find that a simple scaling based solely on the host star's X-ray emission gives large errors in mass loss rates from planetary atmospheres and so we have derived a new method to scale th...

  9. XUV-driven mass loss from extrasolar giant planets orbiting active stars

    Science.gov (United States)

    Chadney, J. M.; Galand, M.; Unruh, Y. C.; Koskinen, T. T.; Sanz-Forcada, J.

    2015-04-01

    Upper atmospheres of Hot Jupiters are subject to extreme radiation conditions that can result in rapid atmospheric escape. The composition and structure of the upper atmospheres of these planets are affected by the high-energy spectrum of the host star. This emission depends on stellar type and age, which are thus important factors in understanding the behaviour of exoplanetary atmospheres. In this study, we focus on Extrasolar Giant Planets (EPGs) orbiting K and M dwarf stars. XUV spectra for three different stars - ɛ Eridani, AD Leonis and AU Microscopii - are constructed using a coronal model. Neutral density and temperature profiles in the upper atmosphere of hypothetical EGPs orbiting these stars are then obtained from a fluid model, incorporating atmospheric chemistry and taking atmospheric escape into account. We find that a simple scaling based solely on the host star's X-ray emission gives large errors in mass loss rates from planetary atmospheres and so we have derived a new method to scale the EUV regions of the solar spectrum based upon stellar X-ray emission. This new method produces an outcome in terms of the planet's neutral upper atmosphere very similar to that obtained using a detailed coronal model of the host star. Our results indicate that in planets subjected to radiation from active stars, the transition from Jeans escape to a regime of hydrodynamic escape at the top of the atmosphere occurs at larger orbital distances than for planets around low activity stars (such as the Sun).

  10. Electron Interference in Molecular Circular Polarization Attosecond XUV Photoionization

    Directory of Open Access Journals (Sweden)

    Kai-Jun Yuan

    2015-01-01

    Full Text Available Two-center electron interference in molecular attosecond photoionization processes is investigated from numerical solutions of time-dependent Schrödinger equations. Both symmetric H\\(_2^+\\ and nonsymmetric HHe\\(^{2+}\\ one electron diatomic systems are ionized by intense attosecond circularly polarized XUV laser pulses. Photoionization of these molecular ions shows signature of interference with double peaks (minima in molecular attosecond photoelectron energy spectra (MAPES at critical angles \\(\\vartheta_c\\ between the molecular \\(\\textbf{R}\\ axis and the photoelectron momentum \\(\\textbf{p}\\. The interferences are shown to be a function of the symmetry of electronic states and the interference patterns are sensitive to the molecular orientation and pulse polarization. Such sensitivity offers possibility for imaging of molecular structure and orbitals.

  11. Japanese sounding rocket experiment with the solar XUV Doppler telescope

    Science.gov (United States)

    Sakao, Taro; Tsuneta, Saku; Hara, Hirohisa; Kano, Ryouhei; Yoshida, Tsuyoshi; Nagata, Shin'ichi; Shimizu, Toshifumi; Kosugi, Takeo; Murakami, Katsuhiko; Wasa, Wakuna; Inoue, Masao; Miura, Katsuhiro; Taguchi, Koji; Tanimoto, Kazuo

    1996-11-01

    We present an overview of an ongoing Japanese sounding rocket project with the Solar XUV Doppler telescope. The telescope employs a pair of normal incidence multilayer mirrors and a back-thinned CCD, and is designed to observe coronal velocity field of the whole sun by measuring line- of-sight Doppler shifts of the Fe XIV 211 angstroms line. The velocity detection limit is estimated to be better than 100 km/s. The telescope will be launched by the Institute of Space and Astronautical Science in 1998, when the solar activity is going to be increasing towards the cycle 23 activity maximum. Together with the overview of the telescope, the current status of the development of each telescope components including multilayer mirrors, telescope structure, image stabilization mechanism, and focal plane assembly, are reviewed. The observation sequence during the flight is also briefly described.

  12. Magnetic Activity and High Energy XUV Irradiances of Dwarf K-Stars - Impacts of XUV Emissions on Hosted Extrasolar Planets

    Science.gov (United States)

    Lakatos, S. L.; Voyer, E. N.; Guinan, E. F.; DeWarf, L. E.; Ribas, I.; Harper, G. M.

    2005-05-01

    We report on the study of magnetic activity and spectral X-ray-UV (XUV) irradiances of main-sequence K-type (dK) stars covering a wide range of ages from <0.1 to 10 Gyr and rotation periods of <0.5 - 45d. This study is an extension of the Villanova ``Sun in Time'' Program (see Guinan et al. 2003; Ribas et al. 2005) to cooler, less luminous, but much more numerous, dK stars. These dK stars have deeper convective zones and more efficient magnetic dynamos. Of particular interest is the study of the evolution of coronal and chromospheric XUV emissions of these stars because of the critical roles that these emissions play in the photochemical and photoionization (and possible erosion) of the atmospheres of potentially hosted planets. The extension to dK stars is motivated by the upcoming extrasolar planet search missions (such as Kepler, SIM, and Darwin-TPF) that will search for earth-size planets in the (liquid water) habitable zones of nearby dG, dK and dM stars. Because of the very high space densities of low mass stars, they will likely be discovered to host numerous planets. In this study we have combined our FUSE FUV observations with archival X-ray, EUV, and UV, along with ground-based photometry, to study dependencies of XUV emissions with respect to age and rotation. Here we report on our initial study of a small sample of bright, nearby dK0-5 stars with a wide range of ages and rotation periods. The initial results are presented and we discuss the suitability of low mass dK stars as hosts for planets habitable for life. Also, the long lifetimes and high spacial densities of older dK stars make them attractive targets for searches for advanced intelligent life. This research is supported by NASA/FUSE Grants NAG5-12125, NNG04G038G, and NNGG04GC76G, which we gratefully acknowledge.

  13. 月基极紫外相机光机结构设计%Design of optical-mechanical structure for lunar-based extreme ultraviolet camera

    Institute of Scientific and Technical Information of China (English)

    王智; 李朝辉

    2011-01-01

    To monitor and research 30.4 nm radiation generated by the plasmasphere,a lunar-basedExtreme Ultraviolet(EUV)camera was developed.A multilayer mirror optical system and a 30.4 nmphoton counting detector were adopted as the main body of the camera,and a two-dimensional tracingmechanism drived by a stepping motor was used to trace the earth.Aim to the vibration and impactfrom the process of satellite launching,orbit changes from earth'S to moon'S,moon landing,and thecruel temperature environment of the moon.The optical-mechanical design of EUV camera gave a con-sideration to the environmental adaptability.After the optimization by finite element analysis,it showsthat the first order resonant frequency of the optical-mechanical structure iS 49.3 Hz with the massless than 15 kg,the motion mechanism operates freely within-50~+80℃,and the mirror surfaceaccuracy(RMS)is 13.44 nm(<14 nm)under the load of uniform temperature drop of 50℃.Those results meet the technical requirements of the camera.%为了对地球等离子体层产生的30.4 nm辐射进行全方位的长期监视和观测,研制了月基极紫外相机.相机主体采用多层膜单反射镜光学系统以及30.4 nm球面光子探测器的结构形式,跟踪机构采用俯仰-方位模式,由步进电机驱动实现对地球的捕获.针对卫星发射、地月变轨、月表着陆过程中的振动冲击以及月表残酷的温度环境,月基极紫外相机的光机结构设计考虑了环境(力学、温度)适应性,有限元分析结果表明,光机结构在整机质量<15 kg条件下,一阶谐振频率为49.3 Hz;运动机构在-50~+80℃运转自如;在50℃均匀温降载荷作用下反射镜面形精度RMS值为13.44nm(<14 nm),满足相机的技术指标要求.

  14. Soft X-ray and extreme ultraviolet optics in CIOMP%长春光机所软X射线-极紫外波段光学研究

    Institute of Scientific and Technical Information of China (English)

    陈波; 尼启良; 王君林

    2007-01-01

    综述了我所软X射线-极紫外波段关键技术的研究进展.描述了软X射线-极紫外波段光源技术,研制了工作波段为6~22 nm的微流靶激光等离子体光源;介绍了光子计数成像探测器技术,研制出了有效直径为25 mm,等效像元分辨率为0.3 mm的极紫外波段探测器;开展了超光滑表面加工、检测技术的研究,研制了超光滑表面抛光机,加工出高面形精度的超光滑表面,面形精度为6 nm(RMS值),表面粗糙度达0.6 nm(RMS值);进行了软X射线-极紫外波段多层膜技术的研究,研制出13 nm处反射率为60%的多层膜反射镜,150 mm 口径反射镜的反射率均匀性优于±2.5%;最后,讨论了软X射线-极紫外波段测量技术研究,研制出该波段反射率计,其测量范围为5~50 nm,光谱分辨率好于0.2 nm,测量重复性好于士1%.在上述关键技术研究基础上,研制出了极紫外波段成像仪和空间极紫外波段太阳望远镜,这些仪器在我国空间科学研究项目中发挥了作用.%Some key technologies on soft X-ray and Extreme Ultraviolet(EUV)optics developed at CIOMP are reviewed in this paper.The technology for laser-produced plasma sources is described and a laser-produced plasma source with a liquid target worked at wavelength range of 6~22 nm has been developed.Soft X-ray and EUV photon-counting imaging is introduced and a two-dimensional photoncounting detector with position sensitive anode is fabricated.The active area of the detector is 25 mm in diameter and the resolution is 0.3 mm.The technology of super-smooth mirror fabrication is studied and a polishing machine has been developed to fabricate the super-smooth surface mirrors with the roughness and the figure of 0.6 nm(RMS)and 6 nm(RMS),respectively.Soft X-ray and EUV multilayer film technologies are coverd also in the paper and a number of mutilayer coating mirrors have been deposited for some space science projects.These multilayer mirrors show their

  15. Very short-term reactive forecasting of the solar ultraviolet index using an extreme learning machine integrated with the solar zenith angle.

    Science.gov (United States)

    Deo, Ravinesh C; Downs, Nathan; Parisi, Alfio V; Adamowski, Jan F; Quilty, John M

    2017-05-01

    Exposure to erythemally-effective solar ultraviolet radiation (UVR) that contributes to malignant keratinocyte cancers and associated health-risk is best mitigated through innovative decision-support systems, with global solar UV index (UVI) forecast necessary to inform real-time sun-protection behaviour recommendations. It follows that the UVI forecasting models are useful tools for such decision-making. In this study, a model for computationally-efficient data-driven forecasting of diffuse and global very short-term reactive (VSTR) (10-min lead-time) UVI, enhanced by drawing on the solar zenith angle (θs) data, was developed using an extreme learning machine (ELM) algorithm. An ELM algorithm typically serves to address complex and ill-defined forecasting problems. UV spectroradiometer situated in Toowoomba, Australia measured daily cycles (0500-1700h) of UVI over the austral summer period. After trialling activations functions based on sine, hard limit, logarithmic and tangent sigmoid and triangular and radial basis networks for best results, an optimal ELM architecture utilising logarithmic sigmoid equation in hidden layer, with lagged combinations of θs as the predictor data was developed. ELM's performance was evaluated using statistical metrics: correlation coefficient (r), Willmott's Index (WI), Nash-Sutcliffe efficiency coefficient (ENS), root mean square error (RMSE), and mean absolute error (MAE) between observed and forecasted UVI. Using these metrics, the ELM model's performance was compared to that of existing methods: multivariate adaptive regression spline (MARS), M5 Model Tree, and a semi-empirical (Pro6UV) clear sky model. Based on RMSE and MAE values, the ELM model (0.255, 0.346, respectively) outperformed the MARS (0.310, 0.438) and M5 Model Tree (0.346, 0.466) models. Concurring with these metrics, the Willmott's Index for the ELM, MARS and M5 Model Tree models were 0.966, 0.942 and 0.934, respectively. About 57% of the ELM model's absolute

  16. Transverse beam diagnostics for the XUV seeding experiment at FLASH

    Energy Technology Data Exchange (ETDEWEB)

    Boedewadt, Joern

    2011-12-15

    High-gain free-electron lasers (FEL) offer intense, transversely coherent, and ultra short radiation pulses in the extreme ultraviolet, the soft- and the hard-X-ray spectral range. Undulator radiation from spontaneous emission is amplified. Due to the stochastic emission process, the radiation exhibits a low temporal coherence, and the structure of the amplified radiation in the temporal and in the spectral domain shows large shot-to-shot fluctuations. In order to improve the temporal coherence, an external radiation pulse is used to induce (or seed) the FEL process. With this, only a defined wavelength range within the FEL bandwidth is amplified provided that the irradiance of the external radiation exceeds the noise level of the FEL amplifier. In addition to the improved longitudinal coherence, a seeded FEL provides the possibility to perform pump-probe experiments with an expected temporal resolution of the order of the pulse durations. In order to experimentally proof this statement, a test experiment for direct HHG-seeding at wavelength below 40 nm was installed at the free-electron laser facility FLASH at DESY. Crucial for the seeded operation of an FEL is the six-dimensional laser-electron overlap of the seed laser pulses with the electron bunches. Hence, dedicated diagnostics to measure and mechanisms to control the overlap are essential. Within this thesis, a transport beamline for the seed laser beam and the transverse diagnostics for seed laser- and the electron-beam were developed and commissioned. Results of the performance of the seed injection beamline are presented, and first measurements of the seeded operation of the FEL are analyzed and evaluated. (orig.)

  17. Development of diffractive XUV-VUV light extractors for fusion plasma diagnostic

    Science.gov (United States)

    Stutman, D.; Caravelli, G.; Delgado-Aparicio, L.; Finkenthal, M.; Tritz, K.; Kaita, R.; Roquemore, L.

    2009-11-01

    The diagnostic and control of next generation MFE and ICF fusion experiments will require optical light extractors capable of withstanding intense plasma and radiation exposure. A solution applicable from the XUV to the infrared is to use free-standing diffractive optics such as transmission gratings or zone plates. Here we present results on XUV-VUV diffractive extractors for the diagnostic of boundary MFE plasmas. For the VUV range we developed Si transmission gratings having 1 μm period, 5 μm thickness, 40% open fraction, 1x2 mm active area, and coated with Ni, while for the XUV range we use SiN gratings having 0.2 μm period, 0.3 μm thickness, 1x1 mm area, and coated with Ta. The grating extractors are spectrally and spatially calibrated in the laboratory using a newly developed extended XUV-VUV source and will be employed for imaging spectrometry on the NSTX experiment. The operational characteristics of the extended source and first space resolved XUV-VUV spectra will be presented. Work supported by DoE Grant DE-FG02-99ER54523 at JHU and Contract DE-AC02-09CH11466 at PU.

  18. SXR-XUV Diagnostics for Edge and Core of Magnetically Confined Plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Stutman, Dan [Johns Hopkins University

    2014-09-10

    The present report summarizes the results obtained during a one-year extension of DoE grant “SXR-XUV Diagnostics for Edge and Core of Magnetically Confined Plasmas”, at Johns Hopkins University, aimed at completing the development of a new type of magnetic fusion plasma diagnostic, the XUV Transmission Grating Imaging Radiometer (TGIR). The TGIR enables simultaneous spatially and spectrally resolved measurements of the XUV/VUV radiated power from impurities in fusion plasmas, with high speed. The instrument was successfully developed and qualified in the laboratory and in experiments on a tokamak. Its future applications will be diagnostic of the impurity content and transport in the divertor and edge of advanced magnetic fusion experiments, such as NSTX Upgrade.

  19. XUV lasing during strong-field assisted transient absorption in molecules

    CERN Document Server

    Bredtmann, Timm; Bandrauk, Andre D; Ivanov, Misha

    2015-01-01

    Using ab-initio non-Born-Oppenheimer simulations, we demonstrate amplification of XUV radiation in a high-harmonic generation type process using the example of the hydrogen molecular ion. A small fraction of the molecules is pumped to a dissociative Rydberg state from which IR-assisted XUV amplification is observed. We show that starting at sufficiently high IR driving field intensities the ground state molecules become quasi-transparent for XUV radiation, while due to stabilization gain from Rydberg states is maintained, thus leading to lasing from strongly driven Rydberg states. Further increase of the IR intensity even leads to gain by initially unexcited molecules, which are quickly excited by the driving IR pulse.

  20. Monochromatization of femtosecond XUV light pulses with the use of reflection zone plates.

    Science.gov (United States)

    Metje, Jan; Borgwardt, Mario; Moguilevski, Alexandre; Kothe, Alexander; Engel, Nicholas; Wilke, Martin; Al-Obaidi, Ruba; Tolksdorf, Daniel; Firsov, Alexander; Brzhezinskaya, Maria; Erko, Alexei; Kiyan, Igor Yu; Aziz, Emad F

    2014-05-05

    We report on a newly built laser-based tabletop setup which enables generation of femtosecond light pulses in the XUV range employing the process of high-order harmonic generation (HHG) in a gas medium. The spatial, spectral, and temporal characteristics of the XUV beam are presented. Monochromatization of XUV light with minimum temporal pulse distortion is the central issue of this work. Off-center reflection zone plates are shown to be advantageous when selection of a desired harmonic is carried out with the use of a single optical element. A cross correlation technique was applied to characterize the performance of the zone plates in the time domain. By using laser pulses of 25 fs length to pump the HHG process, a pulse duration of 45 fs for monochromatized harmonics was achieved in the present setup.

  1. In-situ determination of dispersion and resolving power in simultaneous multiple-angle XUV spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Zastrau, U; Hilbert, V; Foerster, E [Institut fuer Optik und Quantenelektronik (IOQ), Friedrich-Schiller-Universitaet Jena, Max-Wien Platz 1, 07743 Jena (Germany); Brown, C; Gregori, G [Clarendon Laboratory, University of Oxford, Oxford, OX1 3PU (United Kingdom); Doeppner, T; Glenzer, S H [Lawrence Livermore National Laboratory, Post Office Box 808, Livermore, CA 94551 (United States); Dziarzhytski, S; Harmand, M; Laarmann, T; Przystawik, A; Radcliffe, P; Schulz, M; Tavella, F [HASYLAB, Deutsches Elektronen-Synchrotron (DESY), Notkestrasse 85, 22603 Hamburg (Germany); Goede, S; Meiwes-Broer, K-H; Skruszewicz, S [Institut fuer Physik, Universitaet Rostock, D-18051 Rostock (Germany); Hochhaus, D; Neumayer, P [Frankfurt Institute for Advanced Studies (FIAS), Johann Wolfgang Goethe-Universitaet, Max-von-Laue-Str. 1, 60438 Frankfurt am Main (Germany); Lee, H J, E-mail: ulf.zastrau@uni-jena.de [Stanford Linear Accelerator Center (SLAC), Menlo Park, CA 94025 (United States)

    2011-10-15

    We report on the simultaneous determination of non-linear dispersion functions and resolving power of three flat-field XUV grating spectrometers. A moderate-intense short-pulse infrared laser is focused onto technical aluminum which is commonly present as part of the experimental setup. In the XUV wavelength range of 10-19 nm, the spectrometers are calibrated using Al-Mg plasma emission lines. This cross-calibration is performed in-situ in the very same setup as the actual main experiment. The results are in excellent agreement with ray-tracing simulations. We show that our method allows for precise relative and absolute calibration of three different XUV spectrometers.

  2. Ultraviolet filters.

    Science.gov (United States)

    Shaath, Nadim A

    2010-04-01

    The chemistry, photostability and mechanism of action of ultraviolet filters are reviewed. The worldwide regulatory status of the 55 approved ultraviolet filters and their optical properties are documented. The photostabilty of butyl methoxydibenzoyl methane (avobenzone) is considered and methods to stabilize it in cosmetic formulations are presented.

  3. 提高极紫外光谱纯度的多层膜设计及制备%Design and Fabrication of the Multilayer Film of Enhancing Spectral-Purity in Extreme Ultraviolet

    Institute of Scientific and Technical Information of China (English)

    祝文秀; 金春水; 匡尚奇; 喻波

    2012-01-01

    极紫外光刻是实现22 nm技术节点的候选技术.极紫外光刻使用的是波长为13.5 nm的极紫外光,但在160~240 nm波段,极紫外光刻中的激光等离子体光源光谱强度、光刻胶敏感度以及多层膜的反射率均比较高,光刻胶在此波段的曝光会降低光刻系统的光刻质量.从理论和实验两方面验证了在传统Mo/Si多层膜上镀制SiC单层膜可对极紫外光刻中的带外波段进行有效抑制.通过使用X射线衍射仪、椭偏仪以及真空紫外( VUV)分光光度计来确定薄膜厚度、薄膜的光学常数以及多层膜的反射率,设计并制备了[Mo/Si]40SiC多层膜.结果表明,在极紫外波段的反射率减少5%的前提下,带外波段的反射率减少到原来的1/5.%Extreme ultraviolet lithography (EUVL) has been regarded as a promising lithographic technology for the 22 nm hp node. It takes advantage of the light of extreme ultraviolet (EUV) whose wavelength is 13. 5 nm. But in the 160 - 240 nm band,laser produced plasma light source spectral intensity,photoresist sensitivity and the reflectivity of multilayers are relatively large in the EUVL. The exposure of photoresist will reduce the lithographic quality in the out-of-band. It demonstrates that both theoretically and experimentally,coating the SiC layer on the Mo/Si multilayer can effectively suppress the out-of-band radiation. Designing and fabricating [Mo/Si]40 SiC multilayers take advantage of X-ray diffraction,spectroscopic ellipsometry,vacuum ultraviolet ( VUV) spectrophotometer to determine the thickness and optical constants of thin films and the reflectivity of multilayers. The reflectivity of the out-of-band reduces to 1/5,while the reflectivity of in-band only 5% reduction.

  4. Optical design of moon-based earth's plasmaspheric extreme ultraviolet imager%月基地球等离子体层极紫外成像仪的光学设计

    Institute of Scientific and Technical Information of China (English)

    陈波; 何飞

    2011-01-01

    According to the 30. 4 nm radiation properties of the earth' s plasmasphere, an earth' s plasmaspheric extreme ultraviolet imaging method based on the moon was researched for the first time. The technical parameters of the extreme ultraviolet imager used in the lunar surface were determined, and its field of view is 15°, angular resolution is 0. 1° and the entrance pupil area is larger than 70 cm2. By combining a single spherical multilayer mirror and a spherical microchannel plate photon counting imaging detector, the extrame ultraviolet imager was designed. The ray tracing of designed extreme ultraviolet imager with multilayer optics was also performed. Results show that the radii of the blur spots are 0. 210, 0. 204, 0. 204, and 0. 207 mm respectively at 0,3,5, and 7. 5°, which are basically identical at different field of views. In woking on the lunar surface, the imager has a visionscope of 15. 0 Re to cover the main body of the earth's plasmasphere and a spatial resolution of 0. 10 RE that can reveal the main details of the earth' s plasmasphere. It provides a high quality imaging method for the observation of earths plasmasphere.%依据地球等离子体层在30.4 nm的辐射特性,首次以月球为观测点进行地球等离子体层极紫外波段成像观测方法研究.确定了在月球表面使用的极紫外成像仪的技术参数,给出了视场角为15°、角分辨率为0.1°、入瞳面积>70 cm2的极紫外成像仪的结构形式,采用单球面多层膜反射镜与球面微通道板光子计数成像探测器相结合的方式设计了极紫外成像仪.对设计的极紫外多层膜光学系统成像仪进行光线追迹,弥散斑半径分别为0.210 mm(0°视场)、0.204 mm(3°视场)、0.204 mm(5°视场)、0.207 mm(7.5°视场),对应的角分辨率为0.08°,弥散斑在不同视场角度基本均匀,其结果满足设计要求.该仪器可在月球表面工作,获得视场范围为15.0 RE,覆盖地球等离子体层主

  5. Ultraviolet Extensions

    Science.gov (United States)

    2008-01-01

    [figure removed for brevity, see original site] Side-by-Side Comparison Click on image for larger view This ultraviolet image from NASA's Galaxy Evolution Explorer shows the Southern Pinwheel galaxy, also know as Messier 83 or M83. It is located 15 million light-years away in the southern constellation Hydra. Ultraviolet light traces young populations of stars; in this image, young stars can be seen way beyond the main spiral disk of M83 up to 140,000 light-years from its center. Could life exist around one of these far-flung stars? Scientists say it's unlikely because the outlying regions of a galaxy are lacking in the metals required for planets to form. The image was taken at scheduled intervals between March 15 and May 20, 2007. It is one of the longest-exposure, or deepest, images ever taken of a nearby galaxy in ultraviolet light. Near-ultraviolet light (or longer-wavelength ultraviolet light) is colored yellow, and far-ultraviolet light is blue. What Lies Beyond the Edge of a Galaxy The side-by-side comparison shows the Southern Pinwheel galaxy, or M83, as seen in ultraviolet light (right) and at both ultraviolet and radio wavelengths (left). While the radio data highlight the galaxy's long, octopus-like arms stretching far beyond its main spiral disk (red), the ultraviolet data reveal clusters of baby stars (blue) within the extended arms. The ultraviolet image was taken by NASA's Galaxy Evolution Explorer between March 15 and May 20, 2007, at scheduled intervals. Back in 2005, the telescope first photographed M83 over a shorter period of time. That picture was the first to reveal far-flung baby stars forming up to 63,000 light-years from the edge of the main spiral disk. This came as a surprise to astronomers because a galaxy's outer territory typically lacks high densities of star-forming materials. The newest picture of M83 from the Galaxy Evolution Explorer is shown at the right, and was taken over a longer period of time. In fact, it is one of the

  6. Atmosphere expansion and mass loss of close-orbit giant exoplanets heated by stellar XUV. I. Modeling of hydrodynamic escape of upper atmospheric material

    Energy Technology Data Exchange (ETDEWEB)

    Shaikhislamov, I. F. [Institute of Laser Physics SB RAS, Novosibirsk (Russian Federation); Khodachenko, M. L.; Sasunov, Yu. L.; Lammer, H.; Kislyakova, K. G. [Space Research Institute, Austrian Acad. Sci., Graz (Austria); Erkaev, N. V., E-mail: maxim.khodachenko@oeaw.ac.at [Institute of Computational Modelling, SB RAS, Krasnoyarsk (Russian Federation)

    2014-11-10

    In the present series of papers we propose a consistent description of the mass loss process. To study in a comprehensive way the effects of the intrinsic magnetic field of a close-orbit giant exoplanet (a so-called hot Jupiter) on atmospheric material escape and the formation of a planetary inner magnetosphere, we start with a hydrodynamic model of an upper atmosphere expansion in this paper. While considering a simple hydrogen atmosphere model, we focus on the self-consistent inclusion of the effects of radiative heating and ionization of the atmospheric gas with its consequent expansion in the outer space. Primary attention is paid to an investigation of the role of the specific conditions at the inner and outer boundaries of the simulation domain, under which different regimes of material escape (free and restricted flow) are formed. A comparative study is performed of different processes, such as X-ray and ultraviolet (XUV) heating, material ionization and recombination, H{sub 3}{sup +} cooling, adiabatic and Lyα cooling, and Lyα reabsorption. We confirm the basic consistency of the outcomes of our modeling with the results of other hydrodynamic models of expanding planetary atmospheres. In particular, we determine that, under the typical conditions of an orbital distance of 0.05 AU around a Sun-type star, a hot Jupiter plasma envelope may reach maximum temperatures up to ∼9000 K with a hydrodynamic escape speed of ∼9 km s{sup –1}, resulting in mass loss rates of ∼(4-7) · 10{sup 10} g s{sup –1}. In the range of the considered stellar-planetary parameters and XUV fluxes, that is close to the mass loss in the energy-limited case. The inclusion of planetary intrinsic magnetic fields in the model is a subject of the follow-up paper (Paper II).

  7. Observations of solar coronal holes using radio (GMRT & GRH), extreme ultra-violet (SOHO-EIT) and X-ray (GOES-SXI) imaging instruments

    Science.gov (United States)

    Madsen, F. R. H.; Ramesh, R.; Ananthakrishnan, S.; Subramanian, P.; Cecatto, J. R.; Sawant, H. S.

    Solar observations with the Giant Metrewave Radio Telescope GMRT on 06 04 2005 at 150 MHz show evidence for a radio counterpart to a Coronal Hole CH observed as a depression in the radio brightness distribution on the solar disk In this work we compare the structural details of the radio CH using the GMRT observations and the Extreme Ultra Violet EUV and Soft X-Ray SXR images obtained with the SoHO EIT and GOES SXI respectively We also study the density temperature inside the same CH using 115 MHz data from the Gauribidanur Radioheliograph GRH We present and discuss our results for the radio counterpart to this CH focusing on the comparison of its position and size as determined from EUV and SXR with the parameters determined from the GMRT map and on the determination of plasma parameters from the GRH map

  8. A new observational approach to investigate the heliospheric interstellar wind interface - The study of extreme and far ultraviolet resonantly scattered solar radiation from neon, oxygen, carbon and nitrogen

    Science.gov (United States)

    Bowyer, Stuart; Fahr, Hans J.

    1990-01-01

    One of the outstanding uncertainties in the understanding of the heliosphere concerns the character of the interaction between the outflowing solar wind and the interstellar medium. A new possibility for obtaining information on this topic is suggested. The cosmically abundant elements neon, oxygen, carbon, and nitrogen will be affected differently at their interface passage depending upon the character of this region. Consequently, the distribution of these atoms and their ions will vary within the inner heliosphere. The study of resonantly scattered solar radiation from these species will then provide information on the nature of the interface. A preliminary evaluation of this approach has been carried out, and the results are encouraging. The relevant lines to be studied are in the extreme and far ulraviolet. The existing data in these bands are reviewed; unfortunately, past instrumentation has had insufficient resolution and sensitivity to provide useful information. The capabilities of future approved missions with capabilities in this area are evaluated.

  9. Recent Advances on LASERIX Facility: Development of XUV Sources System and Applications. Perspectives from 2008 to 2010

    Science.gov (United States)

    Ros, D.; Kazamias, S.; Guilbaud, O.; Habib, J.; Zielbauer, B.; Pittman, M.; Jamelot, G.; Klisnick, A.; Lagron, J.-C.; Joyeux, D.; de Rossi, S.; Delmotte, F.; Lacombe, S.; Porcel, E.; Lesech, C.; Penhoat, A. M.; Touati, A.

    LASERIX is a high-power laser facility leading to High-repetition-rate XUV laser pumped by Titanium:Sapphire laser. The aim of this laser facility is to offer Soft XRLs in the 30-7 nm range and auxiliary IR beam that could also be used to produce synchronized XUV sources. This experimental configuration highly enhances the scientific opportunities of the facility, giving thus the opportunity to realize both X-ray laser experiments and more generally pump/probe experiments, mixing IR and XUV sources. In this contribution, the main results concerning both the development of XUV sources (in the seeded or ASE mode) and their use for applications (irradiation of DNA samples) are presented.

  10. Single Shot Polarization Characterization of XUV FEL Pulses from Crossed Polarized Undulators

    Science.gov (United States)

    Ferrari, E.; Allaria, E.; Buck, J.; De Ninno, G.; Diviacco, B.; Gauthier, D.; Giannessi, L.; Glaser, L.; Huang, Z.; Ilchen, M.; Lambert, G.; Lutman, A. A.; Mahieu, B.; Penco, G.; Spezzani, C.; Viefhaus, J.

    2015-01-01

    Polarization control is a key feature of light generated by short-wavelength free-electron lasers. In this work, we report the first experimental characterization of the polarization properties of an extreme ultraviolet high gain free-electron laser operated with crossed polarized undulators. We investigate the average degree of polarization and the shot-to-shot stability and we analyze aspects such as existing possibilities for controlling and switching the polarization state of the emitted light. The results are in agreement with predictions based on Gaussian beams propagation. PMID:26314764

  11. The Extreme Ultraviolet and X-Ray Sun in Time: High-Energy Evolutionary Tracks of a Solar-Like Star

    CERN Document Server

    Tu, Lin; Güdel, Manuel; Lammer, Helmut

    2015-01-01

    Aims. We aim to describe the pre-main sequence and main-sequence evolution of X-ray and extreme-ultaviolet radiation of a solar mass star based on its rotational evolution starting with a realistic range of initial rotation rates. Methods. We derive evolutionary tracks of X-ray radiation based on a rotational evolution model for solar mass stars and the rotation-activity relation. We compare these tracks to X-ray luminosity distributions of stars in clusters with different ages. Results. We find agreement between the evolutionary tracks derived from rotation and the X-ray luminosity distributions from observations. Depending on the initial rotation rate, a star might remain at the X-ray saturation level for very different time periods, approximately from 10 Myr to 300 Myr for slow and fast rotators, respectively. Conclusions. Rotational evolution with a spread of initial conditions leads to a particularly wide distribution of possible X-ray luminosities in the age range of 20 to 500 Myrs, before rotational co...

  12. Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0

    Science.gov (United States)

    Kimura, Yosuke; Ishikawa, Dai; Nakano, Akinori; Kobayashi, Akiko; Matsushita, Kiyohiro; de Roest, David; Kobayashi, Nobuyoshi

    2012-05-01

    We investigated the effects of UV-assisted restoration on porous plasma-enhanced chemical vapor deposition (PECVD) SiOCH films with k = 2.0 and 2.3 having high porosities. By applying the UV-assisted restoration to O2-plasma-damaged films with k = 2.0 and 2.3, the recovery of the k-value was observed on the k = 2.3 film in proportion to -OH group reduction. However, the k = 2.0 film did not show recovery in spite of -OH group reduction. We found that hydrocarbon content in the k = 2.0 film was significantly increased by the UV-assisted restoration compared with the k = 2.3 film. According to these findings, we optimized the UV-assisted restoration to achieve improved controllability of the hydrocarbon uptake in the k = 2.0 film and confirmed the recovery of the k-value for O2-plasma-damaged film. Thus, adjusting the hydrocarbon uptake was crucial for restoring extremely porous SiOCH film.

  13. The extreme ultraviolet and X-ray Sun in Time: High-energy evolutionary tracks of a solar-like star

    Science.gov (United States)

    Tu, Lin; Johnstone, Colin P.; Güdel, Manuel; Lammer, Helmut

    2015-05-01

    Aims: We aim to describe the pre-main-sequence and main-sequence evolution of X-ray and extreme-ultaviolet radiation of a solar-mass star based on its rotational evolution starting with a realistic range of initial rotation rates. Methods: We derive evolutionary tracks of X-ray radiation based on a rotational evolution model for solar-mass stars and the rotation-activity relation. We compare these tracks to X-ray luminosity distributions of stars in clusters with different ages. Results: We find agreement between the evolutionary tracks derived from rotation and the X-ray luminosity distributions from observations. Depending on the initial rotation rate, a star might remain at the X-ray saturation level for very different time periods, from ≈10 Myr to ≈300 Myr for slow and fast rotators, respectively. Conclusions: Rotational evolution with a spread of initial conditions leads to a particularly wide distribution of possible X-ray luminosities in the age range of 20-500 Myr, before rotational convergence and therefore X-ray luminosity convergence sets in. This age range is crucial for the evolution of young planetary atmospheres and may thus lead to very different planetary evolution histories.

  14. Formation of a fine-dispersed liquid-metal target under the action of femto- and picosecond laser pulses for a laser-plasma radiation source in the extreme ultraviolet range

    Energy Technology Data Exchange (ETDEWEB)

    Vinokhodov, A Yu; Krivokorytov, M S [EUV Labs, Ltd., Troitsk, Moscow (Russian Federation); Koshelev, K N; Krivtsun, V M; Sidelnikov, Yu V; Medvedev, V V; Kompanets, V O; Melnikov, A A; Chekalin, S V [Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Moscow (Russian Federation)

    2016-01-31

    We report the results of studying the dynamics of deformation and fragmentation of liquid-metal droplets under the action of ultrashort laser pulses. The experiments have been performed to optimise the shape of the droplet target used in extreme ultraviolet (EUV) radiation sources based on the laser-produced plasma using the pre-pulse technology. The pre-pulse is generated by a system incorporating a master Ti : sapphire oscillator and a regenerative amplifier, allowing one to vary the pulse duration from 50 fs to 50 ps. The power density of laser radiation at the droplet target, averaged over the pulse duration and spatial coordinates, has reached 3 × 10{sup 15} W cm{sup -2}. The production of liquid-metal droplets has been implemented by means of a droplet generator based on a nozzle with a ring piezoceramic actuator. The droplet material is the eutectic indium – tin alloy. The droplet generator could operate in the droplet and jet regime with a maximal rate of stable operation 5 and 150 kHz, respectively. The spatial stability of droplet position σ = 1% – 2% of its diameter is achieved. The size of the droplets varied within 30 – 70 μm, their velocity was 2 – 8 m s{sup -1} depending on the operation regime. (interaction of laser radiation with matter. laser plasma)

  15. Unusual electron dynamics in He clusters induced by intense XUV pulses

    Energy Technology Data Exchange (ETDEWEB)

    Ovcharenko, Yevheniy; Moeller, Thomas [IOAP, TU-Berlin (Germany); LaForge, Aaron; Katzy, Raphael; Stienkemeier, Frank [Physikalisches Institut, Universitaet Freiburg (Germany); Lyamayev, Viktor [European XFEL, Hamburg (Germany); O' Keeffe, Patrick [CNR IMIP, Monterotondo Scalo (Italy); Plekan, Oksana; Finetti, Paola; Richter, Robert; Prince, Kevin; Callegari, Carlo [Elettra-Sincrotrone Trieste, Basovizza (Italy); Drabbels, Marcel [EPFL, Lausanne (Switzerland)

    2014-07-01

    The investigation of complex atomic and molecular systems in intense IR and XUV pulses has attracted considerable attention during the last decade, since it leads to a better understanding of light matter interaction. Recently, the first seeded Free Electron Laser FERMI became available for users and now offers unique possibility to perform detailed investigations in such systems due to the narrow bandwidth, fine energy tunability and high intensity in XUV energy range. By using this new source the ionization dynamics in He clusters has been explored with electron spectroscopy in a wide energy range. In addition to the conventional sequential multi-step ionization with a photon energy well above the first ionization potential (IP) a novel ionization process following resonant excitation below IP was observed. It is due to autoionization of two or more electronically excited cluster atoms as predicted recently. The process is very efficient and can exceed the rate of direct photoionization above IP.

  16. Intra- and intercycle interference of electron emission in laser assisted XUV atomic ionization

    CERN Document Server

    Gramajo, Ana Alicia; Garibotti, Carlos Roberto; Arbó, Diego

    2016-01-01

    We study the ionization of atomic hydrogen in the direction of polarization due to a linearly polarized XUV pulse in the presence a strong field IR. We describe the photoelectron spectra as an interference problem in the time domain. Electron trajectories steming from different optical laser cycles give rise to intercycle interference energy peaks known as sidebands. These sidebands are modulated by a grosser structure coming from the intracycle interference of the two electron trajectories born during the same optical cycle. We make use of a simple semiclassical model which offers the possibility to establish a connection between emission times and the photoelectron kinetic energy. We compare the semiclassical predictions with the continuum-distorted wave strong field approximation and the ab initio solution of the time dependent Schr\\"odinger equation. We analyze such interference pattern as a function of the time delay between the IR and XUV pulse and also as a function of the laser intensity.

  17. Experimental studies of X-UV rays by a laser plasma: X-UV strioscopy by means of multilayer mirrors; Etude experimentale de la refraction X-UV par un plasma laser: strioscopie X-UV a l`aide de miroirs multicouches

    Energy Technology Data Exchange (ETDEWEB)

    Lutrin, F

    1996-05-20

    This thesis studies a new instrument -from its conception to the measures interpretation- that analyses electronic density gradient in the super critical transportation area of a laser plasma (0,35 {mu}m). This device, so-called of X-UV Schlieren, is based on the refraction property of a probe beam by an index gradient. Its specificity is the use of the X-UV emission at 13 nm (92 eV) of another laser plasma as X-UV probe. The conception and characterization of this instrument are defined thanks to both the emissivity and reflectivity properties of laser plasmas and the reflectivity properties of multilayers. Within this report are presented strioscopy images, spatially and spectrally resolved of an aluminium plasma from a 3.10{sup 12} W/cm{sup 2} laser flux, probed by a 13 nm wavelength. The device has to be closely aligned so as to obtain good contrast and good spatial resolution. For the first time, the refraction of a X-UV probe beam by a laser plasma is displayed. The experiments show that this refraction is all the more obvious for a gold probe plasma of energy 105 J and an aluminium probed plasma of energy 1 J. According to our plasma hydrodynamic simulation, the detected refraction corresponds to an electronic density gradient of 6,5.10{sup 25} electrons/cm{sup 4} in the two first microns of the sur-critical area. To study the parameters dependence of this gradient in the sur-critical area, several solutions for improving the instrument are produced. (author) 168 refs.

  18. The Variable Polarization XUV Beamline P04 at PETRA III: Optics, mechanics and their performance

    Energy Technology Data Exchange (ETDEWEB)

    Viefhaus, Jens, E-mail: jens.viefhaus@desy.de [Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg (Germany); Scholz, Frank; Deinert, Sascha; Glaser, Leif; Ilchen, Markus; Seltmann, Jörn; Walter, Peter [Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg (Germany); Siewert, Frank, E-mail: frank.siewert@helmholtz-berlin.de [Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie, Albert-Einstein-Straße 15, 12489 Berlin (Germany)

    2013-05-11

    The layout of the Variable Polarization XUV Beamline P04 at PETRA III is described with emphasis on selected examples of optics, mirrors and gratings. A precise characterization of the optics, their performance inside the holder and of the surrounding mechanics is presented. This also includes a detailed characterization of the different beamline mechanics as a whole (grating unit, exit slit unit, re-focusing unit) including the environment.

  19. Angular anisotropy of time delay in XUV/IR photoionization of H$_2^+$

    CERN Document Server

    Serov, Vladislav V

    2016-01-01

    We develop a novel technique for modeling of atomic and molecular ionization in superposition of XUV and IR fields with characteristics typical for attosecond streaking and RABBITT experiments. The method is based on solving the time-dependent Schr\\"odinger equation in the coordinate frame expanding along with the photoelectron wave packet. The efficiency of the method is demonstrated by calculating angular anisotropy of photoemission time delay of the H$_2^+$ ion in a field configuration of recent RABBITT experiments.

  20. CITIUS: an IR-XUV light source for fundamental and applied ultrafast science

    CERN Document Server

    Grazioli, C; Ciavardini, A; Coreno, M; Frassetto, F; Gauthier, D; Golob, D; Ivanov, R; Kivimäki, A; Mahieu, B; Bucar, Bojan; Merhar, M; Miotti, P; Poletto, L; Polo, E; Ressel, B; Spezzani, C; De Ninno, G

    2013-01-01

    We present the main features of CITIUS, a new light source for ultrafast science, generating tunable, intense, femtosecond pulses in the spectral range from IR to XUV. The XUV pulses (about 10^5-10^8 photons/pulse in the range 14-80 eV) are produced by laser-induced high-order harmonic generation in gas. This radiation is monochromatized by a time-preserving monochromator, allowing also to work with high-resolution bandwidth selection. The tunable IR-UV pulses (10^{12}-10^{15} photons/pulse in the range 0.4-5.6 eV) are generated by an optical parametric amplifier, which is driven by a fraction of the same laser pulse that generates high order harmonics. The IR-UV and XUV pulses follow different optical paths and are eventually recombined on the sample for pump-probe experiments. The new light source will become the fulcrum of a new center located at the University of Nova Gorica, active in a wide range of scientific fields, including materials science, catalysis, biochemistry and magnetism. We also present th...

  1. Towards circularly polarized (sub-) femtosecond XUV pulses for ultrafast pump-probe experiments

    Energy Technology Data Exchange (ETDEWEB)

    Schmidt, Juergen; Chew, Soo Hoon; Kranjec, Mihael; Kleineberg, Ulf [LMU Muenchen, Physik-Department, Garching (Germany); Guggenmos, Alexander; Hofstetter, Michael [MPQ fuer Quantenoptik, Garching (Germany)

    2012-07-01

    Circularly polarized (CP) XUV radiation has been demonstrated to be a useful probe for the experimental investigation of electronic effects in magnetic materials such as magnetic circular dichroism, spin-polarized photoemission, magneto-optical Kerr-effect and others. On the laboratory scale, High Harmonic (HH) gas jet sources which inherently provide coherent and ultrashort linearly polarized XUV pulses in the sub-fs domain, suitable to study ultrafast dynamics, have emerged. In our setup we aim at incorporating in-house fabricated broadband transmission multilayer phase shifters into a laser driven 10kHz repetition rate HH Source in the 50-70eV photon energy range. To our knowledge only little investigation on such polarizers intended for use in HH radiation has been made so far. We examine our phase shifters regarding tunability of energy range, phase retardation, transmission efficiency and spectral bandwidth. For this purpose we use a home-made XUV flat-field spectrometer and a multilayer mirror based polarization analyzer. Combining the expected CP pulses with our TOF-PEEM and ARPES spectrometer will pave the way towards time resolved measurements of exchange-coupled electron dynamics.

  2. CO2激光锡等离子体极端紫外及可见光光谱%Extreme Ultraviolet and Visible Emission Spectroscopic Characterization of CO2 Laser Produced Tin Plasma for Lithography

    Institute of Scientific and Technical Information of China (English)

    吴涛; 王新兵; 唐建; 王少义; 饶志明; 杨晨光; 卢宏

    2012-01-01

    The experiments of laser-produced tin plasma are carried out using a CO2 laser with the energy of 400 mJ of each pulse and the full width at half maximum (FWHM) of 75 ns. The temporal evolution of visible emission spectrum are measured using a spectrograph coupled with an intensified charge-coupled device (ICCD) in vacuum. The plasma electron temperature is inferred by the Bolzmann plot method from five singly ionized Sn emission lines, while electron density measurements are made using Stark broadening method by assuming the conditions of local thermodynamic equilibrium. Extreme ultraviolet (EUV) spectral measurement is made throughout the wavelength region of 6.5~16.8 nm using a grazing incidence flat-field grating spectrometer coupled with an X-ray CCD for the detection of time-integrated spectrum. The results show that optical emission spectrum is mainly the continuous spectrum at the early stage of plasma expansion (within the first 100 ns) and the continuous spectrum weakens gradually while the line spectrum becomes dominating. Electron temperature is measured in the range of 2.3~ 0.5 eV, and electron density is measured in the range of 7.6 × 1017 ~ 1. 2 × 1016 cm-3, as the time delay is varied from 0.1 to 2.0 μs. Both the electron temperature and density decrease fast at early delay time and slowly decrease at later delay time. The extreme ultraviolet emission measurement of laser-produced-tin plasma shows that the peak of the EUV spectrum is located at 13.5 nm and the FWHM of the unresolved transition arrays is 1.1 nm.%利用CO2激光烧蚀锡靶产生等离子体,当入射到靶面的单个脉冲能量为400 mJ,半峰全宽(FWHM)为75 ns时,使用光谱仪和增强型电荷耦合器件(ICCD)采集了等离子体的时间分辨光谱.在局域热平衡假设下,利用谱线的斯塔克展宽和五条Sn Ⅱ谱线的相对强度计算并得到了等离子体电子密度、电子温度和辐射谱线强度随时间的变化规律;利用掠入射极端紫

  3. Single-shot spectro-temporal characterization of XUV pulses from a seeded free-electron laser.

    Science.gov (United States)

    De Ninno, Giovanni; Gauthier, David; Mahieu, Benoît; Ribič, Primož Rebernik; Allaria, Enrico; Cinquegrana, Paolo; Danailov, Miltcho Bojanov; Demidovich, Alexander; Ferrari, Eugenio; Giannessi, Luca; Penco, Giuseppe; Sigalotti, Paolo; Stupar, Matija

    2015-08-20

    Intense ultrashort X-ray pulses produced by modern free-electron lasers (FELs) allow one to probe biological systems, inorganic materials and molecular reaction dynamics with nanoscale spatial and femtoscale temporal resolution. These experiments require the knowledge, and possibly the control, of the spectro-temporal content of individual pulses. FELs relying on seeding have the potential to produce spatially and temporally fully coherent pulses. Here we propose and implement an interferometric method, which allows us to carry out the first complete single-shot spectro-temporal characterization of the pulses, generated by an FEL in the extreme ultraviolet spectral range. Moreover, we provide the first direct evidence of the temporal coherence of a seeded FEL working in the extreme ultraviolet spectral range and show the way to control the light generation process to produce Fourier-limited pulses. Experiments are carried out at the FERMI FEL in Trieste.

  4. Extreme ultraviolet lithography: reflective mask technology

    Science.gov (United States)

    Walton, Christopher C.; Kearney, Patrick A.; Mirkarimi, Paul B.; Bowers, Joel M.; Cerjan, Charles J.; Warrick, Abbie L.; Wilhelmsen, Karl C.; Fought, Eric R.; Moore, Craig E.; Larson, Cindy C.; Baker, Sherry L.; Burkhart, Scott C.; Hector, Scott D.

    2000-07-01

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7 nm-pitch bi-layers of Mo and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150 mm substrates, it was upgraded in July 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects > 100 nm below 0.05/cm2. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross- platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank performance at EUV wavelengths.

  5. Equipment for Subpicosecond Extreme Ultraviolet Facility.

    Science.gov (United States)

    1986-02-05

    in a). 4. ) Showing the beam profile of the focus of a diffraction-limited beam on a Reticon after passing through an MSC EMG 201 amplifier without...3 4 - important absence of, the nuclear Contri- Atom A Ato* aement with this conclusion becuse, Ibution arising...form that reexpresses Eq. 12, as hA ’mc2 ~butions moving with relative velocity Y. The - ~) )> 1 (8) nuclear charges of the projectile and target e

  6. The Berkeley extreme ultraviolet calibration facility

    Science.gov (United States)

    Welsh, Barry Y.; Jelinsky, Patrick; Malina, Roger F.

    1988-01-01

    The vacuum calibration facilities of the Space Sciences Laboratory, University of California at Berkeley are designed for the calibration and testing of EUV and FUV spaceborne instrumentation (spectral range 44-2500 A). The facility includes one large cylindrical vacuum chamber (3 x 5 m) containing two EUV collimators, and it is equipped with a 4-axis manipulator of angular-control resolution 1 arcsec for payloads weighing up to 500 kg. In addition, two smaller cylindrical chambers, each 0.9 x 1.2 m, are available for vacuum and thermal testing of UV detectors, filters, and space electronics hardware. All three chambers open into class-10,000 clean rooms, and all calibrations are referred to NBS secondary standards.

  7. Extreme Ultraviolet Lithography - Reflective Mask Technology

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank performance at EUV wavelengths.

  8. Above-threshold ionization in neon produced by combining optical and bichromatic XUV femtosecond pulses

    CERN Document Server

    Douguet, Nicolas; Bartschat, Klaus

    2016-01-01

    We consider the ionization of neon induced by a femtosecond laser pulse composed of overlapping, linearly polarized bichromatic extreme ultraviolet and infrared fields. In particular, we study the effects of the infrared light on a two-pathway ionization scheme for which Ne 2s22p53s1P is used as intermediate state. Using time-dependent calculations, supported by a theoretical approach based on the strong-field approximation, we analyze the ionization probability and the photoelectron angular distributions associated with the different sidebands of the ionization spectrum. Complex oscillations of the angular distribution anisotropy parameters as a function of the infrared light intensity are revealed. Finally, we demonstrate that coherent control of the asymmetry is achievable by tuning the infrared frequency to a nearby electronic transition.

  9. Potential applications of a dual-sweep streak camera system for characterizing particle and photon beams of VUV, XUV, and x-ray FELS

    Energy Technology Data Exchange (ETDEWEB)

    Lumpkin, A. [Argonne National Lab., IL (United States)

    1995-12-31

    The success of time-resolved imaging techniques in the Characterization of particle beams and photon beams of the recent generation of L-band linac-driven or storage ring FELs in the infrared, visible, and ultraviolet wavelength regions can be extended to the VUV, XUV, and x-ray FELs. Tests and initial data have been obtained with the Hamamatsu C5680 dual-sweep streak camera system which includes a demountable photocathode (thin Au) assembly and a flange that allows windowless operation with the transport vacuum system. This system can be employed at wavelengths shorter than 100 nm and down to 1 {Angstrom}. First tests on such a system at 248-nm wavelengths have been performed oil the Argonne Wakefield Accelerator (AWA) drive laser source. A quartz window was used at the tube entrance aperture. A preliminary test using a Be window mounted on a different front flange of the streak tube to look at an x-ray bremsstrahlung source at the AWA was limited by photon statistics. This system`s limiting resolution of {sigma}{approximately}1.1 ps observed at 248 nm would increase with higher incoming photon energies to the photocathode. This effect is related to the fundamental spread in energies of the photoelectrons released from the photocathodes. Possible uses of the synchrotron radiation sources at the Advanced Photon Source and emerging short wavelength FELs to test the system will be presented.

  10. Quantum control of the XUV photoabsorption sp ectrum of helium atoms via the carrier-envelop e-phase of an infrared laser pulse%红外激光载波包络相位对氦原子的极紫外光(XUV)吸收谱的量子调控研究∗

    Institute of Scientific and Technical Information of China (English)

    杨增强; 张力达

    2015-01-01

    In the present paper, we investigate the quantum control of the XUV photoabsorption spectrum of helium atoms via the carrier-envelope-phase (CEP) of an infrared (IR) laser pulse by numerically solving the time-dependent one-dimensional (1D) two-electron Schrödinger equation. The advantage of the 1D model is that the associated time-dependent Schrodinger equation (TDSE) can be solved numerically with high precision as taking full account of the interaction between the electrons and without making any assumptions about the dominant physical mechanisms. In our study, a single attosecond XUV pulse with broad bandwidth is used to create a wave packet consisting of several doubly-excited states. Helium atoms subjected to the XUV pulse can be ionized through two different pathways: either direct ionization into the continuum or indirect ionization via the autoionization of doubly excited states. The interference of these two paths gives rise to the well-known Fano line shape in the photoabsorption spectrum, which is determined by the ratio and relative phases of the two paths. In the presence of an IR laser pulse, however, we find that the Fano line profiles are strongly modified, in good agreement with recent experimental observations [C. Ott et al., Science 340, 716 (2013); C. Ott et al., Nature 516, 374 (2014)]. At certain time delays, we can observe symmetric Lorentz, inverted Fano profiles, and even negative absorption cross sections, indicating that the XUV light can be amplified during the interaction with atoms. We fit the absorption spectra with the Fano line profiles giving rise to the CEP-dependent Fano q parameters, which are modulated from extremely large positive value to extremely large negative value. Since the q parameter is proportional to the ratio between the dipole matrix of the indirect ionization path and the dipole matrix of the direct ionization path;these results indicate that the quantum interference between the two ionization paths can be e

  11. Interference effects and Stark broadening in XUV intrashell transitions in aluminum under conditions of intense XUV free-electron-laser irradiation

    Science.gov (United States)

    Galtier, E.; Rosmej, F. B.; Calisti, A.; Talin, B.; Mossé, C.; Ferri, S.; Lisitsa, V. S.

    2013-03-01

    Quantum mechanical interference effects in the line broadening of intrashell transitions are investigated for dense plasma conditions. Simulations that involved LSJ-split level structure and intermediate coupling discovered unexpected strong line narrowing for intrashell transitions L-L while M-L transitions remained practically unaffected by interference effects. This behavior allows a robust study of line narrowing in dense plasmas. Simulations are carried out for XUV transitions of aluminum that have recently been observed in experiments with the FLASH free-electron laser in Hamburg irradiating solid aluminum samples with intensities greater than 1016 W/cm2. We explore the advantageous case of Al that allows, first, simultaneous observation of M-L transitions and L-L intrashell transitions with high-resolution grating spectrometers and, second, has a convenient threshold to study interference effects at densities much below solid. Finally, we present simulations at near solid density where the line emission transforms into a quasicontinuum.

  12. A Study on the fusion reactor - Development of a flat-field XUV spectrograph for tokamak diagnostics

    Energy Technology Data Exchange (ETDEWEB)

    Nam, Chang Hee; Choi, Il Woo; Shin, Hyun Joon; Cha, Yong Ho; Yang, Ho Soon; Ra, Sun Ae [Korea Advanced Institute of Science and Technology, Taejon (Korea, Republic of); Park, Chan Hong [Kyungwon University, Sungnam (Korea, Republic of)

    1996-09-01

    The research on the development of a flat-field XUV spectrograph for tokamak fusion diagnostics investigated the following items: Theoretical investigation of a flat-field XUV spectrograph to determine the position of toroidal mirror, incident slit, varied-line spacing concave grating, detector, etc, Design and fabrication of spectrograph components using Auto CAD, Design and fabrication of film cassette holder and translator, Design and fabrication of vacuum chamber for spectrograph, Computer simulation of aberration, Installation of spectrograph to tokamak, Design of components for soft x-ray CCD. 24 refs., 3 tabs., 23 figs. (author)

  13. Modélisation de la Physique Atomique et du Transfert Radiatif pour le laser X-UV

    OpenAIRE

    Robillart, Bruno

    2010-01-01

    The X-UV laser sources have been experiencing important development for about ten years. In this spectral range, we are now able to produce highly coherent and intense collimated sources which could have applications in medical imaging, photolithography, or for the diagnostic of dense plasmas... This thesis was dedicated to the modeling of the "OFI" X-UV laser, studied in the LOA (ENSTA, Palaiseau). This type of X-ray laser is generated following the ionization of a gas (Kr, Xe) by a high pow...

  14. A Citizen-Science-enabled Comprehensive Search for XUV-disk Galaxies

    Science.gov (United States)

    Thilker, David A.

    2017-03-01

    Initial efforts to identify extended UV disk (XUV-disk) galaxies were confined to nearby targets using image products from early in the GALEX mission. We developed a beta Zooniverse-based citizen science project to address this issue, specifically (1) allowing a dramatically larger galaxy sample by crowd-sourcing blink comparison UV-optical image inspection to volunteers, and (2) incorporating all archived GALEX data for each target considered. We aim to widely deploy this project to the public within the upcoming year.

  15. Wavefront propagation through the beamline designed for seeding the DESY XUV FEL

    CERN Document Server

    Reininger, R; Gürtler, P; Bahrdt, J

    2001-01-01

    A beamline designed to reduce the spectral bandwidth of the DESY XUV FEL is described. The beamline is intended to cover the wavelength range from 6.4 to 50 nm with three variable line spacing gratings. A plane mirror in front of the grating is used to maintain constant magnification in the dispersion direction. The electric field generated by the first undulator at three wavelengths, 6.4, 13, and 25 nm, is propagated through the beamline. The results show that the beamline has the resolution and imaging properties required for seeding the second undulator at these wavelengths.

  16. XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

    Energy Technology Data Exchange (ETDEWEB)

    Juha, L. [Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8 (Czech Republic)]. E-mail: juha@fzu.cz; Bittner, M. [Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8 (Czech Republic); Faculty of Mathematics and Physics, Charles University in Prague, Ke Karlovu 3, 121 16 Prague 2 (Czech Republic); Chvostova, D. [Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8 (Czech Republic)] (and others)

    2005-06-15

    For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength ({lambda} < 100 nm) lasers, emitting pulses with durations ranging from {approx}10 fs to {approx}1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.

  17. Calibration of the Multi-Spectral Solar Telescope Array multilayer mirrors and XUV filters

    Science.gov (United States)

    Allen, Maxwell J.; Willis, Thomas D.; Kankelborg, Charles C.; O'Neal, Ray H.; Martinez-Galarce, Dennis S.; Deforest, Craig E.; Jackson, Lisa; Lindblom, Joakim; Walker, Arthur B. C., Jr.; Barbee, Troy W., Jr.

    1993-01-01

    The Multi-Spectral Solar Telescope Array (MSSTA), a rocket-borne solar observatory, was successfully flown in May, 1991, obtaining solar images in eight XUV and FUV bands with 12 compact multilayer telescopes. Extensive measurements have recently been carried out on the multilayer telescopes and thin film filters at the Stanford Synchrotron Radiation Laboratory. These measurements are the first high spectral resolution calibrations of the MSSTA instruments. Previous measurements and/or calculations of telescope throughputs have been confirmed with greater accuracy. Results are presented on Mo/Si multilayer bandpass changes with time and experimental potassium bromide and tellurium filters.

  18. Galileo Ultraviolet Spectrometer experiment

    Science.gov (United States)

    Hord, C. W.; Mcclintock, W. E.; Stewart, A. I. F.; Barth, C. A.; Esposito, L. W.; Thomas, G. E.; Sandel, B. R.; Hunten, D. M.; Broadfoot, A. L.; Shemansky, D. E.

    1992-01-01

    The Galileo ultraviolet spectrometer experiment uses data obtained by the Ultraviolet Spectrometer (UVS) mounted on the pointed orbiter scan platform and from the Extreme Ultraviolet Spectrometer (EUVS) mounted on the spinning part of the orbiter with the field of view perpendicular to the spin axis. The UVS is a Ebert-Fastie design that covers the range 113-432 nm with a wavelength resolution of 0.7 nm below 190 and 1.3 nm at longer wavelengths. The UVS spatial resolution is 0.4 deg x 0.1 deg for illuminated disk observations and 1 deg x 0.1 deg for limb geometries. The EUVS is a Voyager design objective grating spectrometer, modified to cover the wavelength range from 54 to 128 nm with wavelength resolution 3.5 nm for extended sources and 1.5 nm for point sources and spatial resolution of 0.87 deg x 0.17 deg. The EUVS instrument will follow up on the many Voyager UVS discoveries, particularly the sulfur and oxygen ion emissions in the Io torus and molecular and atomic hydrogen auroral and airglow emissions from Jupiter. The UVS will obtain spectra of emission, absorption, and scattering features in the unexplored, by spacecraft, 170-432 nm wavelength region. The UVS and EUVS instruments will provide a powerful instrument complement to investigate volatile escape and surface composition of the Galilean satellites, the Io plasma torus, micro- and macro-properties of the Jupiter clouds, and the composition structure and evolution of the Jupiter upper atmosphere.

  19. Photo-induced dynamics in heterocyclic aromatic molecules probed by femtosecond XUV transient absorption spectroscopy

    Science.gov (United States)

    Lackner, Florian; Chatterley, Adam S.; Pemmaraju, Chaitanya D.; Neumark, Daniel M.; Leone, Stephen R.; Gessner, Oliver

    2016-05-01

    We report on the ring-opening and dissociation dynamics of strong-field ionized selenophene (C4 H4 Se), studied by transient XUV absorption spectroscopy at the Se 3d edge. The table-top experiments are facilitated by high-order harmonic generation coupled with a gas phase transient XUV absorption setup that is optimized for the study of organic compounds. Employing element-specific core-to-valence transitions, the ultrafast molecular dynamics are monitored from the perspective of the well-localized Se atoms. Spectral features are assigned based on first principles TDDFT calculations for a large manifold of electronic states. We observe signatures of rapidly (~ 35 fs) decaying highly excited molecular cations, the formation of ring-opened products on a 100 fs time scale and, most notably, the elimination of bare Se+ ions in a very rapid multi-step process. A delayed onset of the Se+ ions provides direct evidence that both selenium-carbon bonds are broken within only ~ 130 fs and that a sequential mechanism, presumably an initial ring-opening followed by a subsequent breaking of the second bond, is required to eliminate the atomic fragments.

  20. Strong XUV irradiation of the Earth-sized exoplanets orbiting the ultracool dwarf TRAPPIST-1

    Science.gov (United States)

    Wheatley, Peter J.; Louden, Tom; Bourrier, Vincent; Ehrenreich, David; Gillon, Michaël

    2017-02-01

    We present an XMM-Newton X-ray observation of TRAPPIST-1, which is an ultracool dwarf star recently discovered to host three transiting and temperate Earth-sized planets. We find the star is a relatively strong and variable coronal X-ray source with an X-ray luminosity similar to that of the quiet Sun, despite its much lower bolometric luminosity. We find LX/Lbol = 2-4 × 10-4, with the total XUV emission in the range LXUV/Lbol = 6-9 × 10-4, and XUV irradiation of the planets that is many times stronger than experienced by the present-day Earth. Using a simple energy-limited model, we show that the relatively close-in Earth-sized planets, which span the classical habitable zone of the star, are subjected to sufficient X-ray and EUV irradiation to significantly alter their primary and any secondary atmospheres. Understanding whether this high-energy irradiation makes the planets more or less habitable is a complex question, but our measured fluxes will be an important input to the necessary models of atmospheric evolution.

  1. Strong XUV irradiation of the Earth-sized exoplanets orbiting the ultracool dwarf TRAPPIST-1

    CERN Document Server

    Wheatley, Peter J; Bourrier, Vincent; Ehrenreich, David; Gillon, Michaël

    2016-01-01

    We present an XMM-Newton X-ray observation of TRAPPIST-1, which is an ultracool dwarf star recently discovered to host three transiting and temperate Earth-sized planets. We find the star is a relatively strong and variable coronal X-ray source with an X-ray luminosity similar to that of the quiet Sun, despite its much lower bolometric luminosity. We find L_x/L_bol=2-4x10^-4, with the total XUV emission in the range L_xuv/L_bol=6-9x10^-4. Using a simple energy-limited model we show that the relatively close-in Earth-sized planets, which span the classical habitable zone of the star, are subject to sufficient X-ray and EUV irradiation to significantly alter their primary and perhaps secondary atmospheres. Understanding whether this high-energy irradiation makes the planets more or less habitable is a complex question, but our measured fluxes will be an important input to the necessary models of atmospheric evolution.

  2. LASERIX: An open facility for developments of EUV and soft X-ray lasers and applications-Developments of XUV sources using high power laser facilities: ILE, ELI

    Energy Technology Data Exchange (ETDEWEB)

    Ros, D., E-mail: david.ros@u-psud.fr [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); LPGP, CNRS-Universite Paris Sud 11 (France); Cassou, K.; Cros, B.; Daboussi, S. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); LPGP, CNRS-Universite Paris Sud 11 (France); Demailly, J. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); Guilbaud, O.; Kazamias, S.; Lagron, J.-C. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); LPGP, CNRS-Universite Paris Sud 11 (France); Maynard, G. [LPGP, CNRS-Universite Paris Sud 11 (France); Neveu, O.; Pittman, M. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); LPGP, CNRS-Universite Paris Sud 11 (France); Zielbauer, B. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); LPGP, CNRS-Universite Paris Sud 11 (France); GSI Darmstadt (Germany); Zimmer, D. [CLUPS-LUMAT, Universite Paris Sud 11-CNRS (France); GSI Darmstadt (Germany); Kuhl, T. [GSI Darmstadt (Germany); Lacombe, S.; Porcel, E. [ISMO, CNRS-Universite Paris Sud 11 (France); Penhoat, M.-A. du [IMCP, Paris VI (France); Zeitoun, P. [LOA, ENSTA-Ecole Polytechnique-CNRS (France); Mourou, G. [ILE (France)

    2011-10-11

    LASERIX is a high-power laser facility leading to High-repetition-rate XUV laser pumped by Titanium:Sapphire laser. The aim of this laser facility is to offer Soft XRLs in the 30-7 nm range and auxiliary IR beam, which could also be used to produce synchronized XUV sources. In this contribution, the main results concerning both the development of XUV sources and their use for applications (irradiation of DNA samples) are presented, as well the present status and some perspectives for LASERIX.

  3. 月基极紫外相机反射镜与探测器间支撑结构%Supporting structure between reflection mirror and detector in lunar-based extreme ultraviolet camera

    Institute of Scientific and Technical Information of China (English)

    王智; 王忠素

    2013-01-01

    In order to meet the requirements of the position precision between reflection mirror and detector of extreme ultraviolet (EUV) camera under the conditions of large level vibration and impact in satellite launching, earth -moon orbit transfer and moon landing, extra large temperature difference on lunar surface and light weight of the camera, the supporting structure between reflection mirror and detector was designed based on carbon fiber reinforced plastic (CFRP) ; and the stability of the supporting structure was analyzed and validated with experiments. Firstly, the form of the supporting structure between reflection mirror and detector is determined according to the optical system of EUV camera. Then, considering the requirements of the camera weight, and the positioning accuracy and stability between reflection mirror and detector of EUV camera,CFRP is adopted as the material for the supporting structure. The reflection mirror surface shape, the angle variation between reflection mirror and detector are analyzed under the weight and temperature loadings. The natural frequency of the supporting structure and the stress responses under sinusoidal and random vibrations in the system are analyzed. Verification experiment results show that the angle variation between reflection mirror and detector is less than 20", and after verification experiment the image resolution meets the specification requirements of the camera.%为了保证月基极紫外相机在卫星发射、地月变轨及月表着陆过程中的大量级振动冲击、月表超大温差环境以及尽量轻的相机重量条件下,反射镜相对于探测器的位置精度要求,设计并研制了基于CFRP(carbon fiber reinforeed plastic)的反射镜与探测器间的支撑结构,分析并试验验证了支撑结构的稳定性.首先,根据极紫外相机的光学系统,确定了反射镜与探测器间的支撑结构形式;然后,考虑相机重量及反射镜相对探测器的位置精度及稳

  4. High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths

    NARCIS (Netherlands)

    Huang, Q.; M. de Boer,; J. Barreaux,; van der Meer, R.; E. Louis,; F. Bijkerk,

    2014-01-01

    High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered

  5. How extreme are extremes?

    Science.gov (United States)

    Cucchi, Marco; Petitta, Marcello; Calmanti, Sandro

    2016-04-01

    High temperatures have an impact on the energy balance of any living organism and on the operational capabilities of critical infrastructures. Heat-wave indicators have been mainly developed with the aim of capturing the potential impacts on specific sectors (agriculture, health, wildfires, transport, power generation and distribution). However, the ability to capture the occurrence of extreme temperature events is an essential property of a multi-hazard extreme climate indicator. Aim of this study is to develop a standardized heat-wave indicator, that can be combined with other indices in order to describe multiple hazards in a single indicator. The proposed approach can be used in order to have a quantified indicator of the strenght of a certain extreme. As a matter of fact, extremes are usually distributed in exponential or exponential-exponential functions and it is difficult to quickly asses how strong was an extreme events considering only its magnitude. The proposed approach simplify the quantitative and qualitative communication of extreme magnitude

  6. Dissociative ionization of H2+ using intense femtosecond XUV laser pulses

    CERN Document Server

    Yue, Lun

    2014-01-01

    The dissociative ionization of H2+ interacting with intense, femtosecond extreme-ultraviolet laser pulses is investigated theoretically. This is done by numerical propagation of the time-dependent Schr\\"{o}dinger equation for a colinear one-dimensional model of H2+, with electronic and nuclear motion treated exactly within the limitations of the model. The joint-energy spectra (JES) are extracted for the fragmented electron and nuclei by means of the t-SURFF method. The dynamic interference effect, which was first observed in one-electron atomic systems, is in the present work observed for H2+, emerging as interference patterns in the JES. The photoelectron spectrum and the nuclear energy spectrum is obtained by integration of the JES. Without the JES, the photoelectron spectrum itself is shown to be inadequate for the observation of the dynamic interference effect. The resulting JES are analyzed in terms of two models. In one model the wave function is expanded in terms of the "essential" states of the syste...

  7. Classical trajectories in polar-asymmetric laser fields: Synchronous THz and XUV emission

    Science.gov (United States)

    Gragossian, Aram; Seletskiy, Denis V.; Sheik-Bahae, Mansoor

    2016-10-01

    The interaction of intense near- and mid-infrared laser pulses with rare gases has produced bursts of radiation with spectral content extending into the extreme ultraviolet and soft x-ray region of electromagnetic spectrum. On the other end of the spectrum, laser-driven gas plasmas has been shown to produce coherent sub-harmonic optical waveforms, covering from terahertz (THz) to mid- and near-infrared frequency spectral band. Both processes can be enhanced via a combination of a driving field and its second harmonic. Despite this striking similarity, only limited experimental and theoretical attempts have been made to address these two regimes simultaneously. Here we present systematic experiments and a unifying picture of these processes, based on our extension of the semi-classical three-step model. Further understanding of the generation and coherent control of time-synchronized transients with photon energies from meV to 1 keV can lead to numerous technological advances and to an intriguing possibilities of ultra-broadband investigations into complex condensed matter systems.

  8. Measurement of XUV-absorption spectra of ZnS radiatively heated foils

    CERN Document Server

    Kontogiannopoulmos, Nikolaos; Thais, Frédéric; Chenais-Popovics, Claude; Sauvan, Pascal; Schott, R; Fölsner, Wolfgang; Arnault, Philippe; Poirier, Michel; Blenski, Thomas

    2008-01-01

    Time-resolved absorption of zinc sulfide (ZnS) and aluminum in the XUV-range has been measured. Thin foils in conditions close to local thermodynamic equilibrium were heated by radiation from laser-irradiated gold spherical cavities. Analysis of the aluminum foil radiative hydrodynamic expansion, based on the detailed atomic calculations of its absorption spectra, showed that the cavity emitted flux that heated the absorption foils corresponds to a radiation temperature in the range 55 60 eV. Comparison of the ZnS absorption spectra with calculations based on a superconfiguration approach identified the presence of species Zn6+ - Zn8+ and S5+ - S6+. Based on the validation of the radiative source simulations, experimental spectra were then compared to calculations performed by post-processing the radiative hydrodynamic simulations of ZnS. Satisfying agreement is found when temperature gradients are accounted for.

  9. Production of ultrashort FEL XUV pulses via a reverse undulator taper

    Science.gov (United States)

    Fawley, W. M.

    2008-08-01

    We adapt the "reverse taper" scheme presented by Saldin et al. (Phys. Rev. ST Accel. Beams 9 (2006) 050702) for attosecond pulse production to the XUV/soft-X-ray regime. We find that GW-level pulses of a few femtosecond duration or shorter can be produced using electron beams of quite moderate parameters and undulators of 20-m length or shorter. The output pulse is significantly shifted in wavelength relative to the main background which permits a further increase in contrast ratio via simple monochromatization. Moreover, the output pulse has a natural wavelength chirp that allows further temporal compression, if wanted. Both positive and negative chirps can be produced depending upon the sign of the undulator taper.

  10. Photoelectron angular distribution in two-pathway ionization of neon with femtosecond XUV pulses

    CERN Document Server

    Douguet, Nicolas; Staroselskaya, Ekaterina I; Bartschat, Klaus; Grum-Grzhimailo, Alexei N

    2016-01-01

    We analyze the photoelectron angular distribution in two-pathway interference between non\\-resonant one-photon and resonant two-photon ionization of neon. We consider a bichromatic femtosecond XUV pulse whose fundamental frequency is tuned near the $2p^5 3s$ atomic states of neon. The time-dependent Schr\\"odinger equation is solved and the results are employed to compute the angular distribution and the associated anisotropy parameters at the main photoelectron line. We also employ a time-dependent perturbative approach, which allows obtaining information on the process for a large range of pulse parameters, including the steady-state case of continuous radiation, i.e., an infinitely long pulse. The results from the two methods are in relatively good agreement over the domain of applicability of perturbation theory.

  11. Electron emission following collective autoionization of He nanodroplets irradiated by intense XUV pulses

    Energy Technology Data Exchange (ETDEWEB)

    Ovcharenko, Yevheniy; Moeller, Thomas [Technische Universitaet Berlin (Germany); Lyamayev, Viktor; Katzy, Raphael; LaForge, Aaron; Stienkemeier, Frank [Universitaet Freiburg (Germany); Devetta, Michele; Piseri, Paolo [University of Milan (Italy); Plekan, Oksana; Richter, Robert; Finetti, Paola; Prince, Kevin; Callegari, Carlo [Sincrotrone Trieste (Italy); O' Keeffe, Patrick; Coreno, Marcello [CNR-IMIP Rome (Italy); Mazza, Tommaso [European XFEL GmbH (Germany); Di Fraia, Michele [University of Trieste (Italy); Brauer, Nils-Benedict; Drabbels, Marcel [EPFL Lausanne (Switzerland); Stranges, Stefano [University of Rome ' ' Sapienza' ' (Italy)

    2013-07-01

    The narrow bandwidth and tunability of FERMI rate at Elettra seeded FEL (Free Electron Laser) open new areas in the study of ultrafast radiation-matter interaction. Using this unique source with high-brilliance femtosecond XUV-pulses, photoelectron spectroscopy of He-nanodroplets has been performed by velocity map imaging technique in the photon energy range 20-27 eV. The electron spectra show that ionization occurs not only by a direct process at photon energies above the ionization potential (IP) but also below the threshold. It was found that electron spectra below IP strongly depend on the total energy absorbed by nanodroplets and give evidence for a collective autoionization process with energy transfer between neighboring atoms.

  12. XUV coherent diffraction imaging in reflection geometry with low numerical aperture.

    Science.gov (United States)

    Zürch, Michael; Kern, Christian; Spielmann, Christian

    2013-09-09

    We present an experimental realization of coherent diffraction imaging in reflection geometry illuminating the sample with a laser driven high harmonic generation (HHG) based XUV source. After recording the diffraction pattern in reflection geometry, the data must be corrected before the image can be reconstructed with a hybrid-input-output (HIO) algorithm. In this paper we present a detailed investigation of sources of spoiling the reconstructed image due to the nonlinear momentum transfer, errors in estimating the angle of incidence on the sample, and distortions by placing the image off center in the computation grid. Finally we provide guidelines for the necessary parameters to realize a satisfactory reconstruction within a spatial resolution in the range of one micron for an imaging scheme with a numerical aperture NA < 0.03.

  13. Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens

    Science.gov (United States)

    Reese, M.; Schäfer, B.; Großmann, P.; Bayer, A.; Mann, K.; Liese, T.; Krebs, H. U.

    2011-01-01

    The focusing properties of a one-dimensional multilayer Laue lens (MLL) were investigated using monochromatic soft X-ray radiation from a table-top, laser-produced plasma source. The MLL was fabricated by a focused ion beam (FIB) structuring of pulsed laser deposited ZrO2/Ti multilayers. This novel method offers the potential to overcome limitations encountered in electron lithographic processes. Utilizing this multilayer Laue lens, a line focus of XUV radiation from a laser-induced plasma in a nitrogen gas puff target could be generated. The evaluated focal length is close to the designed value of 220 μm for the measurement wavelength of 2.88 nm. Divergence angle and beam waist diameter are measured by a moving knife edge and a far-field experiment, determining all relevant second-order moments based beam parameters. The waist diameter has been found to be approximately 370 nm (FWHM).

  14. Ultraviolet diversity of Type Ia Supernovae

    DEFF Research Database (Denmark)

    Foley, Ryan J.; Pan, Yen-Chen; Brown, P.;

    2016-01-01

    Ultraviolet (UV) observations of Type Ia supernovae (SNe Ia) probe the outermost layers of the explosion, and UV spectra of SNe Ia are expected to be extremely sensitive to differences in progenitor composition and the details of the explosion. Here, we present the first study of a sample of high...

  15. Generation of Higher-Order Harmonics By Addition of a High Frequency XUV Radiation to the IR One

    CERN Document Server

    Fleischer, Avner

    2008-01-01

    The irradiation of atoms by a strong IR laser field of frequency $\\omega$ results in the emission of odd-harmonics of $\\omega$ ("IR harmonics") up to some maximal cut-off frequency. The addition of an XUV field of frequency $\\tilde{q}\\omega$ larger than the IR cut-off frequency to the IR driver field leads to the appearance of new higher-order harmonics ("XUV harmonics") $\\tilde{q} \\pm 2K, 2\\tilde{q} \\pm (2K-1), 3\\tilde{q} \\pm 2K,...$ ($K$ integer) which were absent in the spectra in the presence of the IR field alone. The mechanism responsible for the appearance of the XUV harmonics is analyzed analytically using a generalization of the semiclassical re-collision (three-step) model of high harmonic generation. It is shown that the emitted HHG radiation field can be written as a serie of terms, with the HHG field obtained from the three-step model in its most familiar context [P. B. Corkum, \\textit{Phys. Rev. Lett.} {\\bf 71}, 1994 (1993)] resulting from the zeroth-order term. The origin of the higher-order te...

  16. Dichroism in the photoionisation of atoms at XUV free-electron lasers

    Energy Technology Data Exchange (ETDEWEB)

    Mazza, T., E-mail: tommaso.mazza@xfel.eu [European XFEL GmbH, Albert-Einstein-Ring 19, D-22761 Hamburg (Germany); Gryzlova, E.V.; Grum-Grzhimailo, A.N. [Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow 119991 (Russian Federation); Kazansky, A.K. [Departamento de Fisica de Materiales, UPV/EHU, E-20018 San Sebastian/Donostia (Spain); IKERBASQUE, Basque Foundation for Science, E-48011 Bilbao (Spain); Donostia International Physics Center (DIPC), E-20018 San Sebastian/Donostia (Spain); Kabachnik, N.M. [European XFEL GmbH, Albert-Einstein-Ring 19, D-22761 Hamburg (Germany); Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow 119991 (Russian Federation); Donostia International Physics Center (DIPC), E-20018 San Sebastian/Donostia (Spain); Meyer, M., E-mail: michael.meyer@xfel.eu [European XFEL GmbH, Albert-Einstein-Ring 19, D-22761 Hamburg (Germany)

    2015-10-15

    Highlights: • We studied 2-color photoionization of He by angle-resolved electron spectroscopy. • Beta-parameters contain information about the symmetry of outgoing electron waves. • Experiments are compared to strong field approximation and perturbation theory. • 2-Photon measurements can be used to characterize FEL radiation properties. • Non-dipole contributions are predicted to produce new features in the dichroism. - Abstract: Two-color photoionization of atomic He has been investigated by angle-integrated and angle-resolved electron spectroscopy. The combined action of intense radiation pulses from the XUV free-electron laser (FEL), FERMI or FLASH, and a synchronized optical laser on the target atom gives rise to a rich sideband structure in the photoemission spectrum. Measurements of the angular distribution parameters and the determination of the circular and linear dichroism for the two-color photoionization enable a detailed analysis of the symmetry of the outgoing electron waves and of the dynamics underlying the multi-photon processes. The experimental results are in excellent agreement with theoretical results obtained using perturbation theory (low intensity regime) and the strong field approximation. For the particular case of two-photon ionization the measurements represent an ideal tool for characterizing certain FEL parameters, here for example the degree and the sign of circular polarization. Finally, new features of the dichroism are theoretically predicted originating from the non-dipole contribution into the photoionization amplitudes.

  17. VUV/XUV measurements of impurity emission in plasmas with liquid lithium surfaces on LTX

    Science.gov (United States)

    Tritz, Kevin; Bell, Ronald E.; Beiersdorfer, Peter; Boyle, Dennis; Clementson, Joel; Finkenthal, Michael; Kaita, Robert; Kozub, Tom; Kubota, Shigeyuki; Lucia, Matthew; Majeski, Richard; Merino, Enrique; Schmitt, John; Stutman, Dan

    2014-12-01

    The VUV/XUV spectrum has been measured on the Lithium Tokamak eXperiment (LTX) using a transmission grating imaging spectrometer (TGIS) coupled to a direct-detection x-ray charge-coupled device camera. TGIS data show significant changes in the ratios between the lithium and oxygen impurity line emission during discharges with varying lithium wall conditions. Lithium coatings that have been passivated by lengthy exposure to significant levels of impurities contribute to a large O/Li ratio measured during LTX plasma discharges. Furthermore, previous results have indicated that a passivated lithium film on the plasma facing components will function as a stronger impurity source when in the form of a hot liquid layer compared to a solid lithium layer. However, recent TGIS measurements of plasma discharges in LTX with hot stainless steel boundary shells and a fresh liquid lithium coating show lower O/Li impurity line ratios when compared to discharges with a solid lithium film on cool shells. These new measurements help elucidate the somewhat contradictory results of the effects of solid and liquid lithium on plasma confinement observed in previous experiments.

  18. Rovibrational analysis of the XUV photodissociation of HeH{sup +} ions

    Energy Technology Data Exchange (ETDEWEB)

    Loreau, J. [Institute for Theoretical Atomic, Molecular and Optical Physics, Harvard-Smithsonian Center for Astrophysics, Cambridge, Massachusetts 02138 (United States); Lecointre, J.; Urbain, X. [Institute of Condensed Matter and Nanosciences, Universite Catholique de Louvain, B-1348 Louvain-la-Neuve (Belgium); Vaeck, N. [Laboratoire de Chimie Quantique et Photophysique, Universite Libre de Bruxelles, CP160/09, B-1050 Bruxelles (Belgium)

    2011-11-15

    We investigate the dynamics of the photodissociation of the helium hydride ion HeH{sup +} by XUV radiation with the aim to establish a detailed comparison with a recent experimental work carried out at the FLASH free electron laser using both vibrationally hot and cold ions. We determine the corresponding rovibrational distributions using a dissociative charge transfer setup and the same source conditions as in the FLASH experiment. Using a nonadiabatic time-dependent wave-packet method, we calculate the partial photodissociation cross sections for the n=1-3 coupled electronic states of HeH{sup +}. We find good agreement with the experiment for the cross section into the He + H{sup +} dissociative channel. On the other hand, we show that the experimental observation of the importance of the electronic states with n>3 cannot be well explained theoretically, especially for cold (v=0) ions. We find a good agreement with the experiment on the relative contribution of the {Sigma} and {Pi} states to the cross section for the He{sup +} + H channel, but only a qualitative one for the He + H{sup +} channel. We discuss the factors that could explain the remaining discrepancies between theory and experiment.

  19. Far Ultraviolet Astronomy

    Science.gov (United States)

    Sonneborn, George; Rabin, Douglas M. (Technical Monitor)

    2002-01-01

    The Far Ultraviolet Spectroscopic Explorer (FUSE) is studying a wide range of astronomical problems in the 905-1187 Angstrom wavelength region through the use of high resolution spectroscopy. The FUSE bandpass forms a nearly optimal complement to the spectral coverage provided by the Hubble Space Telescope (HST), which extends down to approximately 1170 Angstroms. The photoionization threshold of atomic hydrogen (911 Angstroms) sets a natural short-wavelength limit for the FUV. FUSE was launched in June 1999 from Cape Canaveral, Florida, on a Delta II rocket into a 768 km circular orbit. Scientific observations started later that year. This spectral region is extremely rich in spectral diagnostics of astrophysical gases over a wide range of temperatures (100 K to over 10 million K). Important strong spectral lines in this wavelength range include those of neutral hydrogen, deuterium, nitrogen, oxygen, and argon (H I, D I, N I, O I, and Ar I), molecular hydrogen (H2), five-times ionized oxygen (O VI), and several ionization states of sulfur (S III - S VI). These elements are essential for understanding the origin and evolution of the chemical elements, the formation of stars and our Solar System, and the structure of galaxies, including our Milky Way. FUSE is one of NASA's Explorer missions and a cooperative project of NASA and the space agencies of Canada and France. These missions are smaller, more scientifically focused missions than the larger observatories, like Hubble and Chandra. FUSE was designed, built and operated for NASA by the Department of Physics and Astronomy at Johns Hopkins University. Hundreds of astronomers world-wide are using FUSE for a wide range of scientific research. Some of the important scientific discoveries from the first two years of the mission are described.

  20. Coherent amplification of attosecond light pulses in the water-window spectral region.

    Science.gov (United States)

    Serrat, C; Roca, D; Seres, J

    2015-02-23

    We present a theoretical study on coherent extreme ultraviolet (XUV) attosecond pulse amplification mediated by nonlinear parametric enhanced forward scattering occurring in the interaction of a strong femtosecond infrared (IR) laser pulse combined with a weak attosecond XUV pulse train with an atom. We predict large amplification of XUV radiation when the IR strong pulse and the XUV weak pulse are optimally phased. We study high-order harmonic processes (HHG) in He, He(+) and Ne(++), and show how although the HHG yield is largely affected by the particular atom used as target, nonlinear parametric XUV amplification is only weakly affected. We conclude that XUV nonlinear parametric attosecond pulse amplification can be most efficiently observed by using atoms with a high ionization potential and that the nonlinear amplification is robust at high photon energies where HHG is not efficient, such as in the water-window spectral region.

  1. Microscopie interférentielle X-UV : un outil pour l'étude des endommagements des surfaces optiques

    Science.gov (United States)

    Jamelot, G.; Ros, D.; Cassou, K.; Kazamias, S.; Klisnick, A.; Kozlová, M.; Mocek, T.; Homer, P.; Polan, J.; Stupka, M.

    2006-12-01

    Nous présentons des résultats récents concernant des premières investigations de microscopie interférentielle par laser X-UV d'endommagement optique. Le laser X-UV utilisé est un laser collisionnel en régime quasi-stationnaire émettant à 21.2 nm, développé au Prague Asterix Laser System (PALS, Prague, République Tchèque). Des échantillons de silice fondue de haute qualité, avec ou sans rayure, étaient irradiées en face avant par un laser bleu, correspondant au 3selectfontfontsize{7{9}{textrm{ème}}} harmonique du laser à iode du PALS (1.315 μ m), servant également à réaliser le laser X-UV à 21.2 nm. Celui-ci était utilisé, 5 ns après l'irradiation pour réaliser une imagerie microscopique et interférentielle de la face arrière de l'échantillon. Les résultats font apparaître des déformations locales transitoires. Des premières analyses mettent en évidence une probable variation de la rugosité de la surface. Cette démonstration expérimentale encourageante ouvre la voie à de futures investigations, notamment sur notre prochaine installation laser : LASERIX.

  2. Prospects for laser spectroscopy of highly charged ions with high-harmonic XUV and soft x-ray sources

    OpenAIRE

    Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Winters, Danyal; Kühl, Thomas; Stöhlker, Thomas; Limpert, J.; Tünnermann, A.

    2015-01-01

    We present novel high photon flux XUV and soft x-ray sources based on high harmonic generation (HHG). The sources employ femtosecond fiber lasers, which can be operated at very high (MHz) repetition rate and average power (>100 W). HHG with such lasers results in similar to 10(13) photons s(-1) within a single harmonic line at similar to 40 nm (similar to 30 eV) wavelength, a photon flux comparable to what is typically available at synchrotron beam lines. In addition, resonant enhancement of ...

  3. Extreme Heat

    Science.gov (United States)

    ... Landslides & Debris Flow Nuclear Blast Nuclear Power Plants Power Outages Pandemic Radiological Dispersion Device Severe Weather Snowstorms & Extreme ... Landslides & Debris Flow Nuclear Blast Nuclear Power Plants Power Outages Pandemic Radiological Dispersion Device Severe Weather Snowstorms & Extreme ...

  4. USING RUNNING DIFFERENCE IMAGES TO TRACK PROPER MOTIONS OF XUV CORONAL INTENSITY ON THE SUN

    Energy Technology Data Exchange (ETDEWEB)

    Sheeley, N. R. Jr.; Warren, H. P.; Lee, J., E-mail: neil.sheeley@nrl.navy.mil, E-mail: harry.warren@nrl.navy.mil [Space Science Division, Naval Research Laboratory, Washington, DC 20375-5352 (United States); Chung, S.; Katz, J.; Namkung, M

    2014-12-20

    We have developed a procedure for observing and tracking proper motions of faint XUV coronal intensity on the Sun and have applied this procedure to study the collective motions of cellular plumes and the shorter-period waves in sunspots. Our space/time maps of cellular plumes show a series of tracks with the same 5-8 minute repetition times and ∼100 km s{sup –1} sky-plane speeds found previously in active-region fans and in coronal hole plumes. By synchronizing movies and space/time maps, we find that the tracks are produced by elongated ejections from the unipolar flux concentrations at the bases of the cellular plumes and that the phases of these ejections are uncorrelated from cell to cell. Thus, the large-scale motion is not a continuous flow, but is more like a system of independent conveyor belts all moving in the same direction along the magnetic field. In contrast, the proper motions in sunspots are clearly waves resulting from periodic disturbances in the sunspot umbras. The periods are ∼2.6 minutes, but the sky-plane speeds and wavelengths depend on the heights of the waves above the sunspot. In the chromosphere, the waves decelerate from 35-45 km s{sup –1} in the umbra to 7-8 km s{sup –1} toward the outer edge of the penumbra, but in the corona, the waves accelerate to ∼60-100 km s{sup –1}. Because chromospheric and coronal tracks originate from the same space/time locations, the coronal waves must emerge from the same umbral flashes that produce the chromospheric waves.

  5. Photoconductivité et photoémission de diamant(s) sous irradiation XUV femtoseconde

    Science.gov (United States)

    Gaudin, J.; Geoffroy, G.; Guizard, S.; Esnouf, S.; Olevano, V.; Petite, G.; Klimentov, S. M.; Pivovarov, P. A.; Garnov, S. V.; Carre, B.; Martin, P.; Belsky, A.

    2005-06-01

    Nous décrivons une étude des propriétés de photoconductivité (PC) induite dans différents types de diamants (monocristaux de type IIa et couches CVD) par des impulsions femtosecondes XUV (jusqu'à l'harmonique 19 du laser titane/saphir). En complément de ces études, les spectres de photoémission de ces échantillons ont aussi été étudiés (harmoniques 13 à 27). En fonction de l'ordre de l'harmonique, on constate que le signal de PC augmente tout d'abord (harmoniques 9 à 13) puis diminue au delà. Si l'augmentation s'interprète aisément comme résultant de phénomènes de multiplication par collisions inélastiques, la diminution ultérieure n'a pas pour le moment d'explication. Les mesures de spectre de photoémission suggèrent un effet important de la relaxation par émission de plasmons. Enfin, nous avons réalisé le premier calcul ab-initio de la durée de vie des porteurs tenant compte des interactions électron-électron, à l'aide d'une approche de théorie quantique à plusieurs corps de type GW. Au voisinage du gap, on observe un comportement proche de celui d'un liquide de Fermi. A plus haute énergie on observe des déviations à ce comportement, provenant d'effets de structure de bande d'une part, et d'excitations de plasmons d'autre part.

  6. Mandelbrot's Extremism

    NARCIS (Netherlands)

    Beirlant, J.; Schoutens, W.; Segers, J.J.J.

    2004-01-01

    In the sixties Mandelbrot already showed that extreme price swings are more likely than some of us think or incorporate in our models.A modern toolbox for analyzing such rare events can be found in the field of extreme value theory.At the core of extreme value theory lies the modelling of maxima

  7. XUV exposed, non-hydrostatic hydrogen-rich upper atmospheres of terrestrial planets II: Hydrogen coronae and ion escape

    CERN Document Server

    Kislyakova, K G; Holmström, M; Panchenko, M; Odert, P; Erkaev, N V; Leitzinger, M; Khodachenko, M L; Kulikov, Yu N; Güdel, M; Hanslmeier, A

    2012-01-01

    The interactions between the stellar wind plasma flow of a typical M star such as GJ 436 and hydrogen-rich upper atmospheres of an Earth-like planet and a "super-Earth" with the radius of 2 R_Earth and a mass of 10 M_Earth, located within the habitable zone at ~0.24 AU are studied. The formation of extended atomic hydrogen coronae under the influence of such factors as the stellar XUV flux (soft X-rays and EUV), stellar wind density and velocity, shape of a planetary obstacle (e.g., magnetosphere, ionopause) and the heating efficiency on the evolution of the hydrogen-rich upper atmospheres is investigated. XUV fluxes which are 1, 10, 50 and 100 times higher compared to that of the present Sun are considered and the formation of the high-energy neutral hydrogen clouds around the planets due to charge-exchange reaction under various stellar conditions have been modeled. Charge-exchange between stellar wind protons with the planetary hydrogen atoms and photoionization leads to the production of initially cold io...

  8. Extreme cosmos

    CERN Document Server

    Gaensler, Bryan

    2011-01-01

    The universe is all about extremes. Space has a temperature 270°C below freezing. Stars die in catastrophic supernova explosions a billion times brighter than the Sun. A black hole can generate 10 million trillion volts of electricity. And hypergiants are stars 2 billion kilometres across, larger than the orbit of Jupiter. Extreme Cosmos provides a stunning new view of the way the Universe works, seen through the lens of extremes: the fastest, hottest, heaviest, brightest, oldest, densest and even the loudest. This is an astronomy book that not only offers amazing facts and figures but also re

  9. Vacuum Ultraviolet Xenon Excimer Light Source Excited by a Pulsed Jet Discharge

    National Research Council Canada - National Science Library

    Eiji FUTAGAMI; Toshiaki TAKADA; Junji KAWANAKA; Shoichi KUBODERA; Wataru SASAKI; Kou KUROSAWA; Kenichi MITSUHASHI; Tatsushi IGARASHI

    1995-01-01

      We have developed a new xenon excimer light source in vacuum ultraviolet (VUV). The use of a pulsed gas jet discharge realized efficient cluster excitation and spatially localized emission in VUV with an extremely long pulse duration...

  10. Near-edge x-ray absorption fine structure measurements using a laboratory-scale XUV source

    Science.gov (United States)

    Peth, Christian; Barkusky, Frank; Mann, Klaus

    2008-05-01

    We present a compact setup for near-edge x-ray absorption spectroscopy at the carbon K-edge based on a laser-driven plasma source. To generate the required broad-band emission in the spectral range of the 'water window' (λ = 2.2-4.4 nm) a krypton gas puff target was used. The table-top setup consisting basically of the laser-plasma source and a flat-field spectrometer can be used for near-edge x-ray absorption fine structure experiments in transmission as well as reflection under grazing incidence conditions (ReflEXAFS). The latter method offers the advantage that thin film preparation is not necessary and that the surface sensitivity is strongly enhanced. The results obtained for thin polymer films show good agreement with synchrotron data. Furthermore, we use the ReflEXAFS method to investigate changes in the chemical composition of PMMA induced by extreme ultraviolet (EUV) radiation. The spectra indicate a loss of the carbonyl functional group upon irradiation as well as crosslinking effects at high EUV radiation doses.

  11. Photoionization and fragmentation of H3O+ under XUV irradiation

    DEFF Research Database (Denmark)

    Domesle, C.; Dziarzhytski, S.; Guerassimova, N.;

    2013-01-01

    ++H+ (72±4%), OH0+2H+ (18±6%), and OH++H++H0 (10±1%). A kinematic analysis of the H2O++H+ channel after photoabsorption at 35.56 nm (where only outer valence ionization is possible) showed dissociation into excited states of the water radical ion, where the 1A1 state breaks up into the linear à 2A1 state...... was performed at 21.85 nm, where both inner and outer valence ionization are allowed, and revealed that the XUV photolysis of H3O+ is by far dominated by ionization of outer valence electrons forming the 1A1 and 2E states of the dication H3O2+. The dications were found to dissociate into the channels H2O...

  12. A substorm-associated enhancement in the XUV radiation measuring channel observed by ESP/EVE/SDO

    Science.gov (United States)

    Yan, Yan; Wang, Hua-Ning; Shen, Chao; Du, Zhan-Le

    2016-06-01

    Comparing the ESP/EVE/SDO flux data of 2011 Feb 6, with the counterparts of XRS/GOES and SEM/SOHO, we find that there is an enhancement that is not apparent in the two latter datasets. The enhancement, possibly regarded as a flare at first glimpse, nevertheless, does not involve an energy-release from the Sun. Based on the enhancement, we combine data from SXI/GOES 15 into a synthesized analysis, and concluded that it arises from a particle-associated enhancement in the channel that measures XUV radiation. Paradoxically, it seems to be somewhat of a particle-avalanching process. Prior to the event, a moderate geomagnetic storm took place. Subsequently, while the event is proceeding, a geomagnetic substorm is simultaneously observed. Therefore, the particles, though unidentified, are probably energetic electrons induced by substorm injection.

  13. Ultraviolet radiation and immunosuppression.

    LENUS (Irish Health Repository)

    Murphy, G M

    2009-11-01

    Ultraviolet (UV) radiation is a complete carcinogen. The effects of UV radiation are mediated via direct damage to cellular DNA in the skin and suppression of image surveillance mechanisms. In the context of organ transplantation, addiction of drugs which suppress the immune system add greatly to the carcinogenicity of UV radiation. This review considers the mechanisms of such effects.

  14. Ultraviolet Background Radiation

    Science.gov (United States)

    Henry, R. C.; Murthy, J.

    1993-12-01

    The UVX experiment was carried on the Space Shuttle Columbia between 1986 January 12 and 19 (STS-61C). Several ultraviolet spectrometers were used to obtain measurements of the diffuse ultraviolet background at 8 locations in the sky. We have reanalysed the UVX measurements of the surface brightness of the diffuse ultraviolet background above b = 40 using the dust-scattering model of Onaka & Kodaira (1991), which explicitly takes into account the variation of the source function with galactic longitude. The range of allowed values of interstellar grain albedoJa, and scattering asymmetry parameter g, is considerably expanded over those of a previous analysis. The new chi square probability contours come close to, but do not include, the values of a and g found for the interstellar grains by Witt et al. (1992) using the Ultraviolet Imaging Telescope (UIT) on the Astro mission. If we hypothesize in additon to the dust-scattered light an extragalactic component, of 300 1 100 photons cm-2 s-1 sr-1 A-1, attenuated by a cosecant b law, the new reduction of the UVX data gives complete consistency with the Witt et al. determination of the optical parameters of the grains in the ultraviolet. This work was supported by United States Air Force Contract F19628-93-K-0004, and by National Aeronautics and Space Administration grant NASA NAG5-619. We are grateful for the encouragement of Dr. Stephan Price, and we thank Dr. L. Danly for information. Onaka, T., & Kodaira, K. 1991, ApJ, 379, 532 Witt, A. N., Petersohn, J. K., Bohlin, R. C., O'Connell, R. W., Roberts, M. S., Smith, A. M., & Stecher, T. P. 1992, ApJ, 395, L5

  15. Online coupling of high-resolution chromatography with extreme UV photon activation tandem mass spectrometry: Application to the structural investigation of complex glycans by dissociative photoionization

    Energy Technology Data Exchange (ETDEWEB)

    Ropartz, David, E-mail: David.Ropartz@nantes.inra.fr [INRA, UR1268 Biopolymers Interactions Assemblies F-44316 Nantes (France); Giuliani, Alexandre [Synchrotron SOLEIL, L' Orme des Merisiers, F-91190 Gif-sur-Yvette (France); UAR 1008 CEPIA, INRA, F-44316 Nantes (France); Fanuel, Mathieu [INRA, UR1268 Biopolymers Interactions Assemblies F-44316 Nantes (France); Hervé, Cécile; Czjzek, Mirjam [Sorbonne Universités, Université Pierre et Marie Curie, Paris VI, CNRS, Integrative Biology of Marine Models, UMR 8227, Station Biologique, Place George Teissier, F29688 Roscoff Cedex (France); Rogniaux, Hélène [INRA, UR1268 Biopolymers Interactions Assemblies F-44316 Nantes (France)

    2016-08-24

    The activation of ions by extreme-energy photons (XUV) produced by a synchrotron radiation beamline is a powerful method for characterizing complex glycans using tandem mass spectrometry (MS). As previously described, this activation method leads to rich fragmentation spectra with many structurally valuable cross-ring cleavages while maintaining labile modifications on the glycan structures. However, until now, the tandem MS event was too long to be compatible with liquid chromatography elution times. In this work, the duty cycle of the activation and detection of fragments was shortened, and the background signal on the spectra was drastically reduced. Both improvements allowed, for the first time, the successful coupling of a UHPLC system to XUV-activated tandem MS. The approach was used to characterize a complex mixture of oligo-porphyrans, which are a class of highly sulfated oligosaccharides, in a fully automated way. Due to an enhanced dynamic range and an increased sensitivity, some hypothetical structures of low abundance have been unequivocally confirmed in this study and others have been revised. Some previously undescribed species of oligo-porphyrans that exhibit lateral branching have been fully resolved. This work contributes to the scarce knowledge of the structure of porphyrans in red algae and pushes the current capacities of XUV-activation tandem MS by demonstrating the possibility of a direct coupling with UHPLC. This study will considerably broaden the applicability and practicality of this method in many fields of analytical biology. - Highlights: • For the first time, XUV photon activation tandem MS was coupled to UHPLC. • The approach was used to characterize a complex mixture of biomolecules. • The MSMS duty cycle was compatible with elution times of UHPLC without compromised. • Minor species were characterized with an enhanced sensitivity and dynamic range. • These results broaden the application of the technique in many field of

  16. Reflective optical imaging system for extreme ultraviolet wavelengths

    Science.gov (United States)

    Viswanathan, V.K.; Newnam, B.E.

    1993-05-18

    A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 [mu]m, and preferably less than 100 [mu]m. An image resolution of features less than 0.05-0.1 [mu]m, is obtained over a large area field; i.e., 25.4 mm [times] 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

  17. Evaluation of photomask flatness compensation for extreme ultraviolet lithography

    Science.gov (United States)

    Ballman, Katherine; Lee, Christopher; Zimmerman, John; Dunn, Thomas; Bean, Alexander

    2016-10-01

    As the semiconductor industry continues to strive towards high volume manufacturing for EUV, flatness specifications for photomasks have decreased to below 10nm for 2018 production, however the current champion masks being produced report P-V flatness values of roughly 50nm. Write compensation presents the promising opportunity to mitigate pattern placement errors through the use of geometrically adjusted target patterns which counteract the reticle's flatness induced distortions and address the differences in chucking mechanisms between e-beam write and electrostatic clamping during scan. Compensation relies on high accuracy flatness data which provides the critical topographical components of the reticle to the write tool. Any errors included in the flatness data file are translated to the pattern during the write process, which has now driven flatness measurement tools to target a 6σ reproducibility write compensation is validated against printed wafer results. Topographic features which lack compensation capability must then be held to stringent specifications in order to limit their contributions to the final image placement error (IPE) at wafer. By understanding the capabilities and limitations of write compensation, it is then possible to shift flatness requirements towards the "non-correctable" portion of the reticle's profile, potentially relieving polishers from having to adhere to the current single digit flatness specifications.

  18. Second Topical Meeting on Laser Techniques in the Extreme Ultraviolet.

    Science.gov (United States)

    1985-01-10

    William T. Silfvast, Commissariat a I’Energle Atomique, Centre d’Etudes Obert R. Wood II, John J. Macklin and Hans Lundberg, AT&T il- Valenton, Villeneuve...L’l-uillier, L A. Lompre, G. MaInfray, and C. Manus, Centre Multiphotn Excitlation Techniques. P. M. Dehmer, S. T. Pratt, d’Etudes Nucliaires de...Houston,* Centre for Molecular Seams and Laser Astronomy, University of Rochester, Rochester, N. Chemistry, Department of Chemistry, University of

  19. Corner Rounding in Photoresists for Extreme Ultraviolet Lithography

    Energy Technology Data Exchange (ETDEWEB)

    Anderson, Christopher N.; Naulleau, Patrick; Deng, Yunfei; Wallow, Thomas

    2008-06-01

    Deprotection blur in EUV resists fundamentally limits the smallest sized dense features that can be patterned in a single exposure and development step. Several metrics have recently been developed to explore the ways that different resist and process parameters affect the deprotection blur in EUV resists. One of these metrics is based on the imaging fidelity of a sharp corner on a large feature. As this metric has involved the close inspection of printing fidelity of corner features, it has brought attention to an interesting phenomena: corners print differently whether or not the remaining resist edge contains 270 degrees of resist or 90 degrees of resist. Here we present experimental data across a wide sampling of leading resists to show this effect is real and reproducible. They provide aerial image modeling results assuming thin and realistic mask models that show no corner bias between the aerial images in the 90-degree and 270-degree configurations. They also compare modeled patterning results assuming several resist models including the single blur, dual blur, and Prolith models, none of which reproduce the corner biasing that is observed experimentally.

  20. X-rays and extreme ultraviolet radiation principles and applications

    CERN Document Server

    Attwood, David

    2016-01-01

    With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

  1. A Compact Extreme Ultraviolet Imager (C-EUVI) Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to evaluate the Intevac Photonics NightVista® M711 Low Light Level Camera as the baseline detector of a new Compact EUV imager (C–EUVI). ...

  2. AlN Based Extreme Ultraviolet (EUV) Detectors Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This Phase I project is to investigate the feasibility for achieving EUV detectors for space applications by exploiting the ultrahigh bandgap semiconductor - AlN. We...

  3. Polarimetry of extreme ultraviolet lines in solar astronomy

    Science.gov (United States)

    Fineschi, Silvano; Hoover, Richard B.; Fontenla, Juan M.; Walker, Arthur B. C., Jr.

    1991-01-01

    Ways are suggested in which recent advancements in the fabrication of ultrasmooth, low scatter flow-polished mirror substrates and high-quality multilayer and interference film coatings can be used to create novel optical instruments for observing linear-polarization effects in the outer solar atmosphere. Attention is given to the observational parameters of all-reflective FUV/EUV imaging polarimeters; such a coronagraph/polarimeter, operating at Ly-alpha, could yield the first measurements of coronal vector magnetic fields.

  4. Extreme ultraviolet resist materials for sub-7 nm patterning

    KAUST Repository

    Li, Li

    2017-06-26

    Continuous ongoing development of dense integrated circuits requires significant advancements in nanoscale patterning technology. As a key process in semiconductor high volume manufacturing (HVM), high resolution lithography is crucial in keeping with Moore\\'s law. Currently, lithography technology for the sub-7 nm node and beyond has been actively investigated approaching atomic level patterning. EUV technology is now considered to be a potential alternative to HVM for replacing in some cases ArF immersion technology combined with multi-patterning. Development of innovative resist materials will be required to improve advanced fabrication strategies. In this article, advancements in novel resist materials are reviewed to identify design criteria for establishment of a next generation resist platform. Development strategies and the challenges in next generation resist materials are summarized and discussed.

  5. PROMINENCE PLASMA DIAGNOSTICS THROUGH EXTREME-ULTRAVIOLET ABSORPTION

    Energy Technology Data Exchange (ETDEWEB)

    Landi, E. [Department of Atmospheric, Oceanic and Space Sciences, University of Michigan, Ann Arbor, MI 48109 (United States); Reale, F. [Dipartimento di Fisica e Chimica, Universita di Palermo, Piazza del Parlamento 1, I-90134 Palermo (Italy)

    2013-07-20

    In this paper, we introduce a new diagnostic technique that uses EUV and UV absorption to determine the electron temperature and column emission measure, as well as the He/H relative abundance of the absorbing plasma. If a realistic assumption on the geometry of the latter can be made and a spectral code such as CHIANTI is used, then this technique can also yield the absorbing plasma hydrogen and electron density. This technique capitalizes on the absorption properties of hydrogen and helium at different wavelength ranges and temperature regimes. Several cases where this technique can be successfully applied are described. This technique works best when the absorbing plasma is hotter than 15,000 K. We demonstrate this technique on AIA observations of plasma absorption during a coronal mass ejection eruption. This technique can be easily applied to existing observations of prominences and cold plasmas in the Sun from almost all space missions devoted to the study of the solar atmosphere, which we list.

  6. Extreme Ultraviolet (EUV) induced surface chemistry on Ru

    NARCIS (Netherlands)

    Liu, Feng; Sturm, Jacobus Marinus; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    EUV photon induced surface chemistry can damage multilayer mirrors causing reflectivity loss and faster degradation. EUV photo chemistry involves complex processes including direct photon induced surface chemistry and secondary electron radiation chemistry. Current cleaning techniques include dry an

  7. Capillary discharge extreme ultraviolet lasers. [Colorado State Univ. , Ft. Collins

    Energy Technology Data Exchange (ETDEWEB)

    Rocca, J.J.

    1992-08-01

    The project objective is to explore the generation of soft X-ray laser radiation in a plasma column created by a fast capillary discharge. The proposed capillary lasing scheme offers the potential for compact, simple and efficient soft X-ray laser sources. For this purpose a compact, fast pulse generator which produces 100 kA current pulses with a risetime of 11 ns was constructed. Initial experiments were conducted in evacuated capillaries, in which the plasma is produced by ablation of the capillary walls. The soft X-ray emission from discharges in polyethylene capillary channels was studied to investigate the possibility of amplification in the 3-2 transition of C VI, at {lambda} = 18.2 nm. Time-resolved spectra in which this transition appears anomalously intense with respect to the 4--2 transition of the same ion were obtained. To date, however, this phenomenoa could not be confirmed as gain, as the intensity of the 18.2 nm line has not been observed to increase exponentially as a function of the capillary length. Encouraging results were obtained by fast pulse discharge excitation of capillaries filled with preionized gas. High temperature (Te > 150 eV), small diameter ({approximately}200 {mu}m) plasma columns were efficiently generated. Fast current pulse excitation of a selected low mass density of uniformly preionized material Mag the capillary was observed to detach rapidly the plasma from the capillary walls, and form a plasma channel of a diameter much smaller and significantly hotter than those produced by a similar current pulse in evacuated capillaries of the same size. Discharges in argon-filled capillaries at currents between 20 and 60 kA produced plasmas with ArX-Ar{sub XIV} line emission, and with spectra that are similar to those of plasmas generated by > I MA current implosions in large pulsed power machines. The characteristic of these plasmas approach those necessary for soft X-ray amplification in low Z elements.

  8. Berkeley extreme-ultraviolet airglow rocket spectrometer - BEARS

    Science.gov (United States)

    Cotton, D. M.; Chakrabarti, S.

    1992-01-01

    The Berkeley EUV airglow rocket spectrometer (BEARS) instrument is described. The instrument was designed in particular to measure the dominant lines of atomic oxygen in the FUV and EUV dayglow at 1356, 1304, 1027, and 989 A, which is the ultimate source of airglow emissions. The optical and mechanical design of the instrument, the detector, electronics, calibration, flight operations, and results are examined.

  9. The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

    Energy Technology Data Exchange (ETDEWEB)

    Schäfers, F., E-mail: franz.schaefers@helmholtz-berlin.de; Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J.-S.; Senf, F.; Siewert, F.; Sokolov, A.; Zeschke, Th. [Helmholtz-Zentrum Berlin, Albert-Einstein-Strasse 15, Berlin 12489 (Germany)

    2016-01-01

    A new optics beamline and a versatile 11-axes UHV-reflectometer for at-wavelength characterization of real life-sized UV- and XUV-reflection gratings and other (nano-) optical elements has been set up and is in operation at BESSY-II. Azimuthal rotation of samples allows for reflectometry and polarimetry measurements in s- and p-polarization. A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY-II. The Plane Grating Monochromator beamline operated in collimated light (c-PGM) is equipped with an SX700 monochromator, of which the blazed gratings (600 and 1200 lines mm{sup −1}) have been recently exchanged for new ones of improved performance produced in-house. Over the operating range from 10 to 2000 eV this beamline has very high spectral purity achieved by (i) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (ii) by absorber filters for high-order suppression. Stray light and scattered radiation is removed efficiently by double sets of in situ exchangeable apertures and slits. By use of in- and off-plane bending-magnet radiation the beamline can be adjusted to either linear or elliptical polarization. One of the main features of a novel 11-axes reflectometer is the possibility to incorporate real life-sized gratings. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system carrying a load up to 4 kg, and the reflectivity can be measured between 0 and 90° incidence angle for both s- and p-polarization geometry. This novel powerful metrology facility has gone into operation recently and is now open for external users. First results on optical performance and measurements on multilayer gratings will be presented here.

  10. Transparent ultraviolet photovoltaic cells.

    Science.gov (United States)

    Yang, Xun; Shan, Chong-Xin; Lu, Ying-Jie; Xie, Xiu-Hua; Li, Bing-Hui; Wang, Shuang-Peng; Jiang, Ming-Ming; Shen, De-Zhen

    2016-02-15

    Photovoltaic cells have been fabricated from p-GaN/MgO/n-ZnO structures. The photovoltaic cells are transparent to visible light and can transform ultraviolet irradiation into electrical signals. The efficiency of the photovoltaic cells is 0.025% under simulated AM 1.5 illumination conditions, while it can reach 0.46% under UV illumination. By connecting several such photovoltaic cells in a series, light-emitting devices can be lighting. The photovoltaic cells reported in this Letter may promise the applications in glass of buildings to prevent UV irradiation and produce power for household appliances in the future.

  11. Vacuum ultraviolet spectroscopy I

    CERN Document Server

    Samson, James A; Lucatorto, Thomas

    1998-01-01

    This volume is for practitioners, experimentalists, and graduate students in applied physics, particularly in the fields of atomic and molecular physics, who work with vacuum ultraviolet applications and are in need of choosing the best type of modern instrumentation. It provides first-hand knowledge of the state-of-the-art equipment sources and gives technical information on how to use it, along with a broad reference bibliography.Key Features* Aimed at experimentalists who are in need of choosing the best type of modern instrumentation in this applied field* Contains a detailed chapter on la

  12. Ultraviolet Background Radiation (Preprint)

    Science.gov (United States)

    1991-03-01

    importance is that the sky may be truly outstandingly black in the far ultraviolet, offering a "dark site " that is unprecedented in astronomy...Estimated spectral energy distribution of the night-sky background near the zenith at an excellent ground-based site on a moonless night and in a...1977. Ap. J. Suppl. 33:451 31. Henry, R. C. 1981. Ap. J. Lett. 244: L69 32. Henry, R. C. 1981. 16th Rencontre de Moriond, ed. J. Tran Thanh Van, p

  13. Design of collimation frame structure for lunar-based extreme ultraviolet camera based on carbon fiber reinforced plastics%基于碳纤维复合材料的月基极紫外相机照准架结构设计

    Institute of Scientific and Technical Information of China (English)

    王智

    2012-01-01

    为了减少月基极紫外相机的质量并保证相机的二维转动机构在卫星发射、地月变轨及月表着陆过程中受到大量级振动冲击以及月表超大温差环境下能正常工作,设计并研制了基于碳纤维复合材料(CFRP)的照准架结构。首先,设计了基于金属材料和CFRP的不同照准架结构,通过有限元法对不同材料的照准架进行分析对比,证明了CFRP照准架的优越性。温度和力学验证试验表明:基于CFRP的照准架质量小于其它材料的照准架,其刚度和热稳定性能满足极紫外相机环境适应性的要求。%To lighten the weight of a lunar-based Extreme Ultraviolet(EUV) camera and to ensure the function of the collimation frame structure of the EUV camera under the conditions of the large level vibration caused by satellite launching, earth-moon orbit transfer, moon landing and the large temperature difference on the lunar surface, a collimation frame structure based on Carbon Fiber Reinforced Plastics(CFRP) is designed. Firstly, different collimation frames are designed based on metal materials and the CFRP, and the superiority of the collimation frame based on the CFRP is verified by finite element analysis. Finally, the experiments on tem- peratures and mechanics are performed, and the experiment results show that CFRP collimation frame has a lighter weight and its stiffness and thermal stability meet the requirements of environmental adaptation.

  14. High photon flux XUV and soft x-ray sources enabled by high harmonic generation of high power fiber lasers

    Science.gov (United States)

    Rothhardt, Jan; Hädrich, Steffen; Krebs, Manuel; Limpert, Jens; Tünnermann, Andreas

    2015-07-01

    This contribution reports on the recent advances in high harmonic generation (HHG) with high power femtosecond fiber lasers at high repetition rates. The capabilities of high power fiber lasers, the challenges of phase matching in the tight-focusing regime and recent experimental results will be discussed. In particular, post compressed pules as short as 30 fs, with ~150 μJ pulse energy at 0.6 MHz repetition rate have been used for efficient HHG into the XUV. Despite the tight focusing phase matching is ensured by providing the target gas with adequately high density. A conversion efficiency in excess of 10-6 at ~30 eV has been achieved in xenon gas. This resulted in more than 100μW of average power (>1013 photons per second), which represents the highest photon flux achieved by any HHG source in this spectral region so far. In addition, further pulse compression yielded few-cycle pulses at high average power that have enabled efficient soft Xray generation in neon and helium. HHG in neon provided more than 3·109 photons/s within a 1% bandwidth at 120 eV and helium allowed for HHG up to the water window spectral region beyond 283 eV. These compact sources provide highest photon flux on a table-top and will enable exciting applications such as nanometer-resolution imaging or coincidence spectroscopy in the near future.

  15. Simulation studies of a XUV/soft X-ray harmonic-cascade FEL for the proposed LBNL recirculating linac*

    Energy Technology Data Exchange (ETDEWEB)

    Fawley, W.M.; Barletta, W.A.; Corlett, J.N.; Zholents, A.

    2003-06-02

    Presently there is significant interest at LBNL in designing and building a facility for ultrafast (i.e. femtosecond time scale) x-ray science based upon a superconducting, recirculating RF linac (see Corlett et al. for more details). In addition to producing synchrotron radiation pulses in the 1-15 keV energy range, we are also considering adding one or more free-electron laser (FEL) beamlines using a harmonic cascade approach to produce coherent XUV soft X-ray emission beginning with a strong input seed at {approx}200 nm wavelength obtained from a ''conventional'' laser. Each cascade is composed of a radiator together with a modulator section, separated by a magnetic chicane. The chicane temporally delays the electron beam pulse in order that a ''virgin'' pulse region (with undegraded energy spread) be brought into synchronism with the radiation pulse, which together then undergo FEL action in the modulator. We present various results obtained with the GINGER simulation code examining final output sensitivity to initial electron beam parameters. We also discuss the effects of spontaneous emission and shot noise upon this particular cascade approach which can limit the final output coherence.

  16. XUV complex refractive indices of aerosols in the atmospheres of Titan and the primitive Earth

    Science.gov (United States)

    Gavilan, Lisseth; Neumann, Maciej; Bulkin, Pavel; Popescu, Horia; Steffan, Martin; Esser, Norbert; Carrasco, Nathalie

    2016-10-01

    The complex refractive indices of tholins, simulating aerosols in the atmosphere of Titan and the primitive earth, have been measured over a wide spectral range, including the soft X-ray, vacuum-ultraviolet (VUV), and UV-Visible. The soft X-ray and VUV spectral ranges are in particular relevant to radiative transfer models of solar irradiation of primitive atmospheres (Lammer et al. 2008) and may elucidate the (anti-)greenhouse potential of photochemical aerosols.Thin films were grown using the PAMPRE capacitively coupled plasma setup (Szopa et al. 2006; Carrasco et al. 2009). Gas mixtures consisting of CH4/N2 with 5:95 ratios were used to simulate Titan's atmospheric composition. For the primitive Earth, gas mixtures of N2/CO2/H2 and N2/CO2/CH4 were used as described in Fleury et al. (2014).State-of-the-art laboratory techniques were used to determine the refractive indices of such tholin films. These include VUV ellipsometry (performed in collaboration with the Metrology Light Source in Berlin) and synchrotron X-ray spectroscopy (performed at the SEXTANTS beamline of the SOLEIL synchrotron). While VUV spectroscopy reveals new electronic transitions due to plasmon resonances in tholins, X-ray spectra reveal the C and O absorption edges of these solids. The refractive indices are compared to results from Khare et al. (1984). Implications on the optical properties of these aerosol analogs on the radiative modeling of primitive atmospheres will be discussed.

  17. A pilot study using deep infrared imaging to constrain the star formation history of the XUV stellar populations in NGC 4625

    CERN Document Server

    Bush, Stephanie J; Ashby, M L N; Johnson, Benjamin D; Bresolin, Fabio; Fazio, Giovanni

    2014-01-01

    In a LCDM universe, disk galaxies' outer regions are the last to form. Characterizing their contents is critical for understanding the ongoing process of disk formation, but observing outer disk stellar populations is challenging due to their low surface brightness. We present extremely deep 3.6 micron observations (Spitzer IRAC) of NGC 4625, a galaxy known for its radially extended ultraviolet emitting stellar population. We combine the new imaging with archival UV imaging from the GALEX mission to derive multiwavelength radial profiles for NGC 4625 and compare them to stellar populations models. The colors can be explained by the young stellar population that is responsible for the UV emission and indicate that the current star formation rates in the outermost disk are recent. Extended star formation in NGC 4625 may have been initiated by an interaction with neighboring galaxies NGC 4618 and NGC 4625a, supporting speculation that minor interactions are a common trigger for outer disk star formation and late...

  18. The infrared-ultraviolet connection

    NARCIS (Netherlands)

    Veltman, M.J.G.

    1981-01-01

    Physics below 300 GeV is termed infrared, and physics above 1 TeV is called ultraviolet. Some aspects of the relation between these two regions are discussed. It is argued that the symmetries of the infrared must be symmetries in the ultraviolet. Furthermore, naturalness within the context of the st

  19. Studies of high repetition rate laser-produced plasma soft-X-ray amplifiers; Etudes d'amplificateurs plasma laser a haute cadence dans le domaine X-UV et applications

    Energy Technology Data Exchange (ETDEWEB)

    Cassou, K

    2006-12-15

    The progress made as well on the Ti:Sa laser system, as in the control and the knowledge of laser produced X-UV sources allowed the construction of a X-UV laser station dedicated to the applications. My thesis work falls under the development of this station and more particularly on the characterization of a X-UV laser plasma amplifier. The experimental study relates to the coupling improvement of the pump infra-red laser with plasma within the framework of the transient collisional X-UV laser generation. These X-UV lasers are generated in a plasma formed by the interaction of a solid target and a laser pulse of approximately 500 ps duration, followed by a second infra-red laser pulse known as of pump (about 5 ps) impinging on the target in grazing incidence. For the first time, a complete parametric study was undertaken on the influence of the grazing angle on the pumping of the amplifying medium. One of the results was to reach very high peak brightness about 10{sup 28} ph/s/mm{sup 2}/mrad{sup 2}/(0.1%bandwidth), which compares well with the free-electron laser brightness. Moreover, we modified then used a new two-dimensional hydrodynamic code with adaptive mesh refinement in order to understand the influence of the space-time properties of the infra-red laser on the formation and the evolution of the amplifying plasma. Our modeling highlighted the interest to use a super Gaussian transverse profile for the line focus leading to an increase in a factor two of the gain region size and a reduction of the electron density gradient by three orders of magnitude. These improvements should strongly increase the energy contained in X-UV laser beam. We thus used X-UV laser to study the appearance of transient defects produced by a laser IR on a beam-splitter rear side. We also began research on the mechanisms of DNA damage induced by a very intense X-UV radiation. (author)

  20. Scanning Transmission X-ray Microscopy with X-ray Fluorescence Detection at the XUV Beamline P04, PETRA III, DESY

    Science.gov (United States)

    Andrianov, K.; Lühl, L.; Nisius, T.; Haidl, A.; Gnewkow, R.; Lötgering, L.; Dierks, H.; Kanngießer, B.; Wilhein, T.

    2017-06-01

    The presented scanning transmission x-ray microscope (STXM), build on top of our existing modular platform (FlexIX) for high resolution imaging experiments, allows versatile investigations of different samples. The FlexIX endstation allows to switch between a Full Field and a STXM mode. For the STXM mode we use a spatialy resolved detector together with an energy dispersive detector, this allows to investigate the morphology and the chemical or elemental distribution of the sample simultaneous. The combination of the nanoscopy endstation and the XUV beamline P04 results in a powerful tool for investigations of life science samples.

  1. Ultraviolet Radiation from Evolved Stellar Populations -- I. Models

    CERN Document Server

    Dorman, B; O'Connell, R

    1993-01-01

    This series of papers comprises a systematic exploration of the hypothesis that the far ultraviolet radiation from star clusters and elliptical galaxies originates from extremely hot horizontal-branch (HB) stars and their post-HB progeny. This first paper presents an extensive grid of calculations of stellar models from the Zero Age Horizontal Branch through to a point late in post-HB evolution or a point on the white dwarf cooling track. We use the term `Extreme Horizontal Branch' (EHB) to refer to HB sequences of constant mass that do not reach the thermally-pulsing stage on the AGB. These models evolve after core helium exhaustion

  2. The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II.

    Science.gov (United States)

    Schäfers, F; Bischoff, P; Eggenstein, F; Erko, A; Gaupp, A; Künstner, S; Mast, M; Schmidt, J-S; Senf, F; Siewert, F; Sokolov, A; Zeschke, Th

    2016-01-01

    A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY-II. The Plane Grating Monochromator beamline operated in collimated light (c-PGM) is equipped with an SX700 monochromator, of which the blazed gratings (600 and 1200 lines mm(-1)) have been recently exchanged for new ones of improved performance produced in-house. Over the operating range from 10 to 2000 eV this beamline has very high spectral purity achieved by (i) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (ii) by absorber filters for high-order suppression. Stray light and scattered radiation is removed efficiently by double sets of in situ exchangeable apertures and slits. By use of in- and off-plane bending-magnet radiation the beamline can be adjusted to either linear or elliptical polarization. One of the main features of a novel 11-axes reflectometer is the possibility to incorporate real life-sized gratings. The samples are adjustable within six degrees of freedom by a newly developed UHV-tripod system carrying a load up to 4 kg, and the reflectivity can be measured between 0 and 90° incidence angle for both s- and p-polarization geometry. This novel powerful metrology facility has gone into operation recently and is now open for external users. First results on optical performance and measurements on multilayer gratings will be presented here.

  3. Prospects for laser spectroscopy of highly charged ions with high-harmonic XUV and soft x-ray sources

    Science.gov (United States)

    Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Winters, D. F. A.; Kühl, Th; Stöhlker, Th; Limpert, J.; Tünnermann, A.

    2015-11-01

    We present novel high photon flux XUV and soft x-ray sources based on high harmonic generation (HHG). The sources employ femtosecond fiber lasers, which can be operated at very high (MHz) repetition rate and average power (>100 W). HHG with such lasers results in ˜1013 photons s-1 within a single harmonic line at ˜40 nm (˜30 eV) wavelength, a photon flux comparable to what is typically available at synchrotron beam lines. In addition, resonant enhancement of HHG can result in narrow-band harmonics with high spectral purity—well suited for precision spectroscopy. These novel light sources will enable seminal studies on electronic transitions in highly-charged ions. For example, at the experimental storage ring 2s1/2-2p1/2 transitions in Li-like ions can be excited up to Z = 47 (˜100 eV transition energy), which provides unique sensitivity to quantum electro-dynamical effects and nuclear corrections. We estimate fluorescence count rates of the order of tens per second, which would enable studies on short-lived isotopes as well. In combination with the Doppler up-shift available in head-on excitation at future heavy-ion storage rings, such as the high energy storage ring, even multi-keV transitions can potentially be excited. Pump-probe experiments with femtosecond resolution could also be feasible and access the lifetime of short-lived excited states, thus providing novel benchmarks for atomic structure theory.

  4. Phototherapy cabinet for ultraviolet radiation therapy

    Energy Technology Data Exchange (ETDEWEB)

    Horwitz, S.N.; Frost, P.

    1981-08-01

    A newly designed cabinet can be used for the treatment of psoriasis with fluorescent ultraviolet (UV) lamps. the new design provides more uniform distribution of UV radiation in both the horizontal and vertical axes, and several safety features have been added. The distribution and uniformity of UV output in this and in a previously described cabinet are compared. The UV output at the vertical center of the older UV light cabinet was six times greater than that at either the top or bottom, while the design of the present cabinet provides uniform UV radiation except for a slight increase at head height and at the level of the lower legs compared with the middle third of the cabinet. The variation in output of the older cabinet may, in part, explain the commonly encountered difficulty in the phototherapy of psoriasis of the scalp and lower extremities.

  5. SUMER: Solar Ultraviolet Measurements of Emitted Radiation

    Science.gov (United States)

    Wilhelm, K.; Axford, W. I.; Curdt, W.; Gabriel, A. H.; Grewing, M.; Huber, M. C. E.; Jordan, M. C. E.; Lemaire, P.; Marsch, E.; Poland, A. I.

    1988-01-01

    The SUMER (solar ultraviolet measurements of emitted radiation) experiment is described. It will study flows, turbulent motions, waves, temperatures and densities of the plasma in the upper atmosphere of the Sun. Structures and events associated with solar magnetic activity will be observed on various spatial and temporal scales. This will contribute to the understanding of coronal heating processes and the solar wind expansion. The instrument will take images of the Sun in EUV (extreme ultra violet) light with high resolution in space, wavelength and time. The spatial resolution and spectral resolving power of the instrument are described. Spectral shifts can be determined with subpixel accuracy. The wavelength range extends from 500 to 1600 angstroms. The integration time can be as short as one second. Line profiles, shifts and broadenings are studied. Ratios of temperature and density sensitive EUV emission lines are established.

  6. Ultraviolet radiation in Finland

    Energy Technology Data Exchange (ETDEWEB)

    Taalas, P.; Koskela, T.; Damski, J.; Supperi, A. [Finnish Meteorological Inst., Helsinki (Finland). Section of Ozone and UV Research; Kyroe, E. [Finnish Meteorological Inst., Sodankylae (Finland). Sodankylae Observatory

    1996-12-31

    Solar ultraviolet radiation is damaging for living organisms due to its high energy pro each photon. The UV radiation is often separated into three regions according to the wavelength: UVC (200-280 nm), UVB (280-320 nm) and UVA (320-400 nm). The most hazardous part, UVC is absorbed completely in the upper atmosphere by molecular oxygen. UVB radiation is absorbed by atmospheric ozone partly, and it is reaching Earth`s surface, as UVA radiation. Besides atmospheric ozone, very important factors in determining the intensity of UVB radiation globally are the solar zenith angle and cloudiness. It may be calculated from global ozone changes that the clear-sky UVB doses may have enhanced by 10-15 % during spring and 5-10 % during summer at the latitudes of Finland, following the decrease of total ozone between 1979-90. The Finnish ozone and UV monitoring activities have become a part of international activities, especially the EU Environment and Climate Programme`s research projects. The main national level effort has been the Finnish Academy`s climatic change programme, SILMU 1990-95. This presentation summarises the scientific results reached during the SILMU project

  7. Ultraviolet radiation and cyanobacteria.

    Science.gov (United States)

    Rastogi, Rajesh Prasad; Sinha, Rajeshwar P; Moh, Sang Hyun; Lee, Taek Kyun; Kottuparambil, Sreejith; Kim, Youn-Jung; Rhee, Jae-Sung; Choi, Eun-Mi; Brown, Murray T; Häder, Donat-Peter; Han, Taejun

    2014-12-01

    Cyanobacteria are the dominant photosynthetic prokaryotes from an ecological, economical, or evolutionary perspective, and depend on solar energy to conduct their normal life processes. However, the marked increase in solar ultraviolet radiation (UVR) caused by the continuous depletion of the stratospheric ozone shield has fueled serious concerns about the ecological consequences for all living organisms, including cyanobacteria. UV-B radiation can damage cellular DNA and several physiological and biochemical processes in cyanobacterial cells, either directly, through its interaction with certain biomolecules that absorb in the UV range, or indirectly, with the oxidative stress exerted by reactive oxygen species. However, cyanobacteria have a long history of survival on Earth, and they predate the existence of the present ozone shield. To withstand the detrimental effects of solar UVR, these prokaryotes have evolved several lines of defense and various tolerance mechanisms, including avoidance, antioxidant production, DNA repair, protein resynthesis, programmed cell death, and the synthesis of UV-absorbing/screening compounds, such as mycosporine-like amino acids (MAAs) and scytonemin. This study critically reviews the current information on the effects of UVR on several physiological and biochemical processes of cyanobacteria and the various tolerance mechanisms they have developed. Genomic insights into the biosynthesis of MAAs and scytonemin and recent advances in our understanding of the roles of exopolysaccharides and heat shock proteins in photoprotection are also discussed.

  8. Higgs ultraviolet softening

    CERN Document Server

    Brivio, I; Gavela, M B; Gonzalez-Garcia, M C; Merlo, L; Rigolin, S

    2014-01-01

    We analyze the leading effective operators which induce a quartic momentum dependence in the Higgs propagator, for a linear and for a non-linear realization of electroweak symmetry breaking. Their specific study is relevant for the understanding of the ultraviolet sensitivity to new physics. Two methods of analysis are applied, trading the Lagrangian coupling by: i) a "ghost" scalar, after the Lee-Wick procedure; ii) other effective operators via the equations of motion. The two paths are shown to lead to the same effective Lagrangian at first order in the operator coefficients. It follows a modification of the Higgs potential and of the fermionic couplings in the linear realization, while in the non-linear one anomalous quartic gauge couplings, Higgs-gauge couplings and gauge-fermion interactions are induced in addition. Finally, all LHC Higgs and other data presently available are used to constrain the operator coefficients; the future impact of $pp\\rightarrow\\text{4 leptons}$ data via off-shell Higgs excha...

  9. Higgs ultraviolet softening

    Science.gov (United States)

    Brivio, I.; Éboli, O. J. P.; Gavela, M. B.; Gonzalez-García, M. C.; Merlo, L.; Rigolin, S.

    2014-12-01

    We analyze the leading effective operators which induce a quartic momentum dependence in the Higgs propagator, for a linear and for a non-linear realization of electroweak symmetry breaking. Their specific study is relevant for the understanding of the ultraviolet sensitivity to new physics. Two methods of analysis are applied, trading the Lagrangian coupling by: i) a "ghost" scalar, after the Lee-Wick procedure; ii) other effective operators via the equations of motion. The two paths are shown to lead to the same effective Lagrangian at first order in the operator coefficients. It follows a modification of the Higgs potential and of the fermionic couplings in the linear realization, while in the non-linear one anomalous quartic gauge couplings, Higgs-gauge couplings and gauge-fermion interactions are induced in addition. Finally, all LHC Higgs and other data presently available are used to constrain the operator coefficients; the future impact of pp → 4 leptons data via off-shell Higgs exchange and of vector boson fusion data is considered as well. For completeness, a summary of pure-gauge and gauge-Higgs signals exclusive to non-linear dynamics at leading-order is included.

  10. ULTRAVIOLET TECHNOLOGY FOR FOOD PRESERVATION

    OpenAIRE

    Guedes, AMM; Novello, D; Mendes, GMD; Cristianini, M

    2009-01-01

    ULTRAVIOLET TECHNOLOGY FOR FOOD PRESERVATION This literature review article had as objective to gather information about ultraviolet (UV) technology utilization on the food industry, its effects and potential application. Aspects as the origin, concept and applications of the technology on the equipment industry and running mechanisms were approached. The application of UV radiation on food decontamination is still little used due its low penetration, but it is known that it can be easily app...

  11. Modelling ultraviolet threats

    Science.gov (United States)

    James, I.

    2016-10-01

    Electro-optically (EO) guided surface to air missiles (SAM) have developed to use Ultraviolet (UV) wavebands supplementary to the more common Infrared (IR) wavebands. Missiles such as the US Stinger have been around for some time but are not considered a proliferation risk. The Chinese FN-16 and Russian SA-29 (Verba) are considered a much higher proliferation risk. As a result, models of the missile seekers must be developed to understand the characteristics of the seeker and the potential performance enhancement that are included. Therefore, the purpose of this paper is to introduce the steps that have been taken to characterise and model these missiles. It begins by outlining some of the characteristics of the threats, the key elements of a UV scene, the potential choice of waveband for a detector, the initial modelling work to represent the UV detector of the missile and presents initial results. The modelling shows that the UV detection range of a typical aircraft is dependent on both the size of the aircraft and its reflectivity. However, the strength of this correlation is less than expected. As a result, further work is required to model more seeker types and to investigate what is causing the weak correlations found in these initial investigations. In addition, there needs to be further study of the sensitivities of the model to other variables, such as the modelled detectivity of the detector and the signal to noise ratio assumed. Overall, the outcome of this work will be to provide specifications for aircraft size and reflectivity that limit the effectiveness of the UV channels.

  12. Ultraviolet-radiation-curable paints

    Energy Technology Data Exchange (ETDEWEB)

    Grosset, A M; Su, W F.A.; Vanderglas, E

    1981-09-30

    In product finishing lines, ultraviolet radiation curing of paints on prefabricated structures could be more energy efficient than curing by natural gas fired ovens, and could eliminate solvent emission. Diffuse ultraviolet light can cure paints on three dimensional metal parts. In the uv curing process, the spectral output of radiation sources must complement the absorption spectra of pigments and photoactive agents. Photosensitive compounds, such as thioxanthones, can photoinitiate unsaturated resins, such as acrylated polyurethanes, by a free radical mechanism. Newly developed cationic photoinitiators, such as sulfonium or iodonium salts (the so-called onium salts) of complex metal halide anions, can be used in polymerization of epoxy paints by ultraviolet light radiation. One-coat enamels, topcoats, and primers have been developed which can be photoinitiated to produce hard, adherent films. This process has been tested in a laboratory scale unit by spray coating these materials on three-dimensional objects and passing them through a tunnel containing uv lamps.

  13. Extremely Preterm Birth

    Science.gov (United States)

    ... Events Advocacy For Patients About ACOG Extremely Preterm Birth Home For Patients Search FAQs Extremely Preterm Birth ... Spanish FAQ173, June 2016 PDF Format Extremely Preterm Birth Pregnancy When is a baby considered “preterm” or “ ...

  14. Investigating Ag nanostructures by TOF-PEEM using high harmonic radiation

    Energy Technology Data Exchange (ETDEWEB)

    Chew, Soo Hoon; Spaeth, Christian K.; Schmidt, Juergen; Kleineberg, Ulf [Department of Physics, Ludwig Maximilian University of Munich, Garching (Germany); Suessmann, Frederik; Guggenmos, Alexander; Yang, Yingying; Wirth, Adrian; Zherebtsov, Sergey; Hofstetter, Michael; Kling, Matthias F.; Krausz, Ferenc [Max-Planck-Institute of Quantum Optics, Garching (Germany); Stockman, Mark I. [Georgia State University, Altanta (United States)

    2011-07-01

    We demonstrate first experimental results on imaging plasmonic nanostructures by Time-of Flight-Photoelectron Emission Microscope (TOF-PEEM) in combination with Extreme Ultraviolet (XUV) attosecond pulses from a High Harmonic Generation source. The 1 kHz coherent attosecond XUV radiation is produced by ionizing neon atoms with waveform-controlled near-infrared (0.6 mJ,5 fs) laser pulses and spectrally filtered at 93 eV by means of a multilayer mirror. We have characterized various polycrystalline Cu microstructures and Ag nanostructures using these ultrashort XUV pulses by TOF-PEEM with a spatial resolution approaching 100 nm. The electron energy spectrum have been investigated at different sample positions and energy filtering has been applied to improve image resolution. The experiments demonstrate first steps towards the temporal characterization of nanoscaled localized surface plasmon fields in a femtosecond optical-pump/attosecond XUV-probe experiments.

  15. The Extreme Hosts of Extreme Supernovae

    CERN Document Server

    Neill, James D; Gal-Yam, Avishay; Quimby, Robert; Ofek, Eran; Wyder, Ted K; Howell, D Andrew; Nugent, Peter; Seibert, Mark; Martin, D Christopher; Overzier, Roderik; Barlow, Tom A; Foster, Karl; Friedman, Peter G; Morrissey, Patrick; Neff, Susan G; Schiminovich, David; Bianchi, Luciana; Donas, José; Heckman, Timothy M; Lee, Young-Wook; Madore, Barry F; Milliard, Bruno; Rich, R Michael; Szalay, Alex S

    2010-01-01

    We use GALEX ultraviolet (UV) and optical integrated photometry of the hosts of seventeen luminous supernovae (LSNe, having peak M_V 100 M_sun), by appearing in low-SFR hosts, are potential tests for theories of the initial mass function that limit the maximum mass of a star based on the S FR.

  16. XUV-exposed, non-hydrostatic hydrogen-rich upper atmospheres of terrestrial planets. Part II: hydrogen coronae and ion escape.

    Science.gov (United States)

    Kislyakova, Kristina G; Lammer, Helmut; Holmström, Mats; Panchenko, Mykhaylo; Odert, Petra; Erkaev, Nikolai V; Leitzinger, Martin; Khodachenko, Maxim L; Kulikov, Yuri N; Güdel, Manuel; Hanslmeier, Arnold

    2013-11-01

    We studied the interactions between the stellar wind plasma flow of a typical M star, such as GJ 436, and the hydrogen-rich upper atmosphere of an Earth-like planet and a "super-Earth" with a radius of 2 R(Earth) and a mass of 10 M(Earth), located within the habitable zone at ∼0.24 AU. We investigated the formation of extended atomic hydrogen coronae under the influences of the stellar XUV flux (soft X-rays and EUV), stellar wind density and velocity, shape of a planetary obstacle (e.g., magnetosphere, ionopause), and the loss of planetary pickup ions on the evolution of hydrogen-dominated upper atmospheres. Stellar XUV fluxes that are 1, 10, 50, and 100 times higher compared to that of the present-day Sun were considered, and the formation of high-energy neutral hydrogen clouds around the planets due to the charge-exchange reaction under various stellar conditions was modeled. Charge-exchange between stellar wind protons with planetary hydrogen atoms, and photoionization, lead to the production of initially cold ions of planetary origin. We found that the ion production rates for the studied planets can vary over a wide range, from ∼1.0×10²⁵ s⁻¹ to ∼5.3×10³⁰ s⁻¹, depending on the stellar wind conditions and the assumed XUV exposure of the upper atmosphere. Our findings indicate that most likely the majority of these planetary ions are picked up by the stellar wind and lost from the planet. Finally, we estimated the long-time nonthermal ion pickup escape for the studied planets and compared them with the thermal escape. According to our estimates, nonthermal escape of picked-up ionized hydrogen atoms over a planet's lifetime within the habitable zone of an M dwarf varies between ∼0.4 Earth ocean equivalent amounts of hydrogen (EO(H)) to <3 EO(H) and usually is several times smaller in comparison to the thermal atmospheric escape rates.

  17. Towards imaging of ultrafast molecular dynamics using FELs

    NARCIS (Netherlands)

    Rouzee, A.; Johnsson, P.; Rading, L.; Siu, W.; Huismans, Y.; Duesterer, S.; Redlin, H.; Tavella, F.; Stojanovic, N.; Al-Shemmary, A.; Lepine, F.; Holland, D. M. P.; Schlathölter, Thomas; Hoekstra, R.; Fukuzawa, H.; Ueda, K.; Vrakking, M. J. J.; Hundertmark, A.

    2013-01-01

    The dissociation dynamics induced by a 100 fs, 400 nm laser pulse in a rotationally cold Br-2 sample was characterized by Coulomb explosion imaging (CEI) using a time-delayed extreme ultra-violet (XUV) FEL pulse, obtained from the Free electron LASer in Hamburg (FLASH). The momentum distribution of

  18. Single-order lamellar multilayer gratings

    NARCIS (Netherlands)

    Meer, van der R.

    2013-01-01

    A major challenge in the soft x-ray (SXR) and eXtreme UltraViolet (XUV) spectral ranges is the ability to manipulate the incident radiation using optical elements. By patterning conventional multilayer mirrors with nanoscale structures, novel optical elements with a variety of optical properties can

  19. Coherent control of High-harmonic generation

    NARCIS (Netherlands)

    Barreaux, J.L.P.

    2012-01-01

    High-harmonic generation (HHG) is a non-linear optical process that can convert laser light with standard wavelengths, such as infrared light, into coherent radiation at much shorter wavelengths in the XUV (extreme ultraviolet) or soft X-ray regime. As opposed to low-order nonlinear frequency

  20. Single-shot fluctuations in waveguided high-harmonic generation

    NARCIS (Netherlands)

    Goh, S.J.; Tao, Y.; Slot, van der P.J.M.; Bastiaens, H.J.M.; Herek, J.L.; Biedron, S.G.; Danailov, M.B.; Milton, S.V.; Boller, K-J.

    2015-01-01

    For exploring the application potential of coherent soft x-ray (SXR) and extreme ultraviolet radiation (XUV) provided by high-harmonic generation, it is important to characterize the central output parameters. Of specific importance are pulse-to-pulse (shot-to-shot) fluctuations of the high-harmonic

  1. A pilot study using deep infrared imaging to constrain the star formation history of the XUV stellar populations in NGC 4625

    Energy Technology Data Exchange (ETDEWEB)

    Bush, Stephanie J.; Ashby, M. L. N.; Fazio, Giovanni [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02143 (United States); Kennicutt, Robert C.; Johnson, Benjamin D. [Institute of Astronomy, University of Cambridge, Madingley Road, Cambridge CB3 0HA (United Kingdom); Bresolin, Fabio, E-mail: sbush@cfa.harvard.edu [Institute for Astronomy, University of Hawaii, 2680 Woodlawn Drive, Honolulu, HI 96822 (United States)

    2014-09-20

    In a ΛCDM universe, disk galaxies' outer regions are the last to form. Characterizing their contents is critical for understanding the ongoing process of disk formation, but observing outer disk stellar populations is challenging due to their low surface brightness. We present extremely deep 3.6 μm observations (Spitzer/Infrared Array Camera) of NGC 4625, a galaxy known for its radially extended ultraviolet-emitting stellar population. We combine the new imaging with archival UV imaging from the GALEX mission to derive multi-wavelength radial profiles for NGC 4625 and compare them to stellar populations models. The colors can be explained by the young stellar population that is responsible for the UV emission and indicate that the current star formation rates in the outermost disk are recent. Extended star formation in NGC 4625 may have been initiated by an interaction with neighboring galaxies NGC 4618 and NGC 4625a, supporting speculation that minor interactions are a common trigger for outer disk star formation and late stage disk growth.

  2. Ultraviolet light and cutaneous lupus

    NARCIS (Netherlands)

    Bijl, Marc; Kallenberg, Cees G. M.

    2006-01-01

    Exposure to ultraviolet (UV) light is one of the major factors known to trigger cutaneous disease activity in (systemic) lupus erythematosus patients. UV light, UVB in particular, is a potent inducer of apoptosis. Currently, disturbed clearance of apoptotic cells is one of the concepts explaining th

  3. Ultraviolet light and cutaneous lupus

    NARCIS (Netherlands)

    Bijl, Marc; Kallenberg, Cees G. M.

    2006-01-01

    Exposure to ultraviolet (UV) light is one of the major factors known to trigger cutaneous disease activity in (systemic) lupus erythematosus patients. UV light, UVB in particular, is a potent inducer of apoptosis. Currently, disturbed clearance of apoptotic cells is one of the concepts explaining th

  4. Multidimensional extremal dependence coefficients

    OpenAIRE

    2017-01-01

    Extreme values modeling has attracting the attention of researchers in diverse areas such as the environment, engineering, or finance. Multivariate extreme value distributions are particularly suitable to model the tails of multidimensional phenomena. The analysis of the dependence among multivariate maxima is useful to evaluate risk. Here we present new multivariate extreme value models, as well as, coefficients to assess multivariate extremal dependence.

  5. The European Extreme Right and Religious Extremism

    Directory of Open Access Journals (Sweden)

    Jean-Yves Camus

    2007-12-01

    Full Text Available The ideology of the Extreme Right in Western Europe is rooted in Catholic fundamentalism and Counter-Revolutionary ideas. However, the Extreme Right, like all other political families, has had to adjust to an increasingly secular society. The old link between religion and the Extreme Right has thus been broken and in fact already was when Fascism overtook Europe: Fascism was secular, sometimes even anti-religious, in its essence. Although Catholic fundamentalists still retain strong positions within the apparatus of several Extreme Right parties (Front National, the vote for the Extreme Right is generally weak among regular churchgoers and strong among non-believers. In several countries, the vote for the Extreme Right is stronger among Protestant voters than among Catholics, since while Catholics may support Christian-Democratic parties, there are very few political parties linked to Protestant churches. Presently, it also seems that Paganism is becoming the dominant religious creed within the Extreme Right. In a multicultural Europe, non-Christian forms of religious fundamentalism such as Islamism also exist with ideological similarities to the Extreme Right, but this is not sufficient to categorize Islamism as a form of Fascism. Some Islamist groups seek alliances with the Extreme Right on the basis of their common dislike for Israel and the West, globalization and individual freedom of thought.

  6. Regulation of keratin expression by ultraviolet radiation: differential and specific effects of ultraviolet B and ultraviolet a exposure.

    Science.gov (United States)

    Bernerd, F; Del Bino, S; Asselineau, D

    2001-12-01

    Skin, the most superficial tissue of our body, is the first target of environmental stimuli, among which is solar ultraviolet radiation. Very little is known about the regulation of keratin gene expression by ultraviolet radiation, however, although (i) it is well established that ultraviolet exposure is involved in skin cancers and photoaging and (ii) keratins represent the major epidermal proteins. The aim of this study was to analyze the regulation of human keratin gene expression under ultraviolet B (290-320 nm) or ultraviolet A (320-400 nm) irradiation using a panel of constructs comprising different human keratin promoters cloned upstream of a chloramphenicol acetyl transferase reporter gene and transfected into normal epidermal keratinocytes. By this approach, we demonstrated that ultraviolet B upregulated the transcription of keratin 19 gene and to a lesser extent the keratin 6, keratin 5, and keratin 14 genes. The DNA sequence responsible for keratin 19 induction was localized between -130 and +1. In contrast to ultraviolet B, ultraviolet A irradiation induced only an increase in keratin 17, showing a differential gene regulation between these two ultraviolet ranges. The induction of keratin 19 was confirmed by studying the endogenous protein in keratinocytes in classical cultures as well as in skin reconstructed in vitro and normal human skin. These data show for the first time that keratin gene expression is regulated by ultraviolet radiation at the transcriptional level with a specificity regarding the ultraviolet domain of solar light.

  7. Intense XUV Radiation Sources.

    Science.gov (United States)

    1987-09-30

    absorption I lite p laSTI1 \\% ere \\ e0\\ Cdiat ridgi t tug Ies to tie Incident spectroscon\\ be loss 31) imi l While plastria emissions laser hean wkith tile...lie pl asmhas were prod uiced h foCUSi11 titlie ou tpu t e xpu SLiFres wu thI a B R\\ sparlk sOITt re hut, at Ilie Puls front a \\d : )A6i laser (1.1004...and laser input and between the target’s cylinder axis and the viewing input plane. However, in the spectroscopic experiments two dielectric coated

  8. Ultraviolet extensions of particle physics

    DEFF Research Database (Denmark)

    Berthier, Laure Gaëlle

    The discovery of the Higgs boson in 2012 at the Large Hadron Collider completed the Standard Model field content. Many questions though remain unanswered by the Standard Model triggering a search for new physics. New physics could manifest itself at the Large Hadron Collider by the discovery of new...... particles. However, the lack of new resonances might suggest that these new particles are still out of reach which leaves us with few options. Two possibilities are explored in this thesis. The first is to study precision measurements which might indicate new physics as small deviations from the Standard...... are expressed as power series with missing higher order terms. We also show how to connect ultraviolet models of new physics to the Standard Model effective field theory and calculate bounds on them using the Standard Model effective field theory fit results. Finally, we study a nonrelativistic ultraviolet...

  9. Hummingbirds see near ultraviolet light.

    Science.gov (United States)

    Goldsmith, T H

    1980-02-15

    Three species of hummingbird (Archilochus alexandri, Lampornis clemenciae, and Eugenes fulgens) were trained to make visual discriminations between lights of different spectral content. On the basis of initial choices of feeders following a period of conditioning, birds of all three species were able to distinguish near ultraviolet (370 nanometers, 20-nanometer half bandwidth) from darkness (unilluminated viewing screen) or from the small amount of far red light that leaked through the ultraviolet-transmitting glass filter. A human observer was unable to make either discrimination. The birds were also able to distinguish white lights lacking wavelengths shorter than 400 nanometers from the full spectrum of the quartz-halogen bulbs. One can infer that the cone oil droplets, which have been lost from the retinas of most mammals, provide a potentially more flexible system for restricting the short wavelength end of the visible spectrum than does the filtering action of lens and macula that serves this function in the human eye.

  10. Ultraviolet Photodissociation of Molecular Beams.

    Science.gov (United States)

    1980-12-15

    Continue on reerse side if neceesry and identify by block number) Photodissociation , excimer laser, nitrocompounds, carbon disulfide, sulfur dioxide ...4 ULTRAVIOLET PHOTODISSOCIATION OF MOLECULAR BEAMS. * TYPE OF REPORT (TECHNICAL, FINAL, ETC.) FINAL REPOT OR PERIOD 0/01/77 - 9/30/80 AUTHOR (S... Photodissociation of Final report for period 10/01/77 - 9/30/80 Molecular Beams 6. PERFORMIN, CRG. REPORT NUMBER 7. AUTHOR(e) S. CONTRACT OR GRANT NUMBER(e) R

  11. Ultraviolet-visible nanophotonic devices

    OpenAIRE

    2010-01-01

    Ankara : The Department of Electrical and Electronics Engineering and the Institute of Engineering and Sciences of Bilkent University, 2010. Thesis (Ph. D.) -- Bilkent University, 2010. Includes bibliographical references leaves 130-141. Recently in semiconductor market, III-Nitride materials and devices are of much interest due to their mechanical strength, radiation resistance, working in the spectrum from visible down to the deep ultraviolet region and solar-blind device ...

  12. Ultraviolet Protection by Fabric Engineering

    Directory of Open Access Journals (Sweden)

    Mukesh Kumar Singh

    2013-01-01

    Full Text Available Background. The increasing emission of greenhouse gases has evoked the human being to save the ozone layer and minimize the risk of ultraviolet radiation (UVR. Various fabric structures have been explored to achieve desired ultraviolet protection factor (UPF in various situations. Objective. In this study, the effect of various filament configurations like twisted, flat, intermingled, and textured in multifilament yarns on fabric in different combinations is assessed in order to engineer a fabric of better ultraviolet protection factor (UPF. Methods. In order to engineer a fabric having optimum UV protection with sufficient comfort level in multifilament woven fabrics, four different yarn configurations, intermingled, textured, twisted, and flat, were used to develop twelve different fabric samples. The most UV absorbing and most demanding fibre polyethylene terephthalate (PET was considered in different filament configuration. Results. The combinations of intermingled warp with flat, intermingled, and textured weft provided excellent UVR protection comparatively at about 22.5 mg/cm2 fabric areal density. The presence of twisted yarn reduced the UV protection due to enhanced openness in fabric structure. Conclusion. The appropriate combination of warp and weft threads of different configuration should be selected judiciously in order to extract maximum UV protection and wear comfort attributes in multifilament woven PET fabrics.

  13. Ultraviolet Diversity of Type Ia Supernovae

    CERN Document Server

    Foley, Ryan J; Brown, P; Filippenko, A V; Fox, O D; Hillebrandt, W; Kirshner, R P; Marion, G H; Milne, P A; Parrent, J T; Pignata, G; Stritzinger, M D

    2016-01-01

    Ultraviolet (UV) observations of Type Ia supernovae (SNe Ia) probe the outermost layers of the explosion, and UV spectra of SNe Ia are expected to be extremely sensitive to differences in progenitor composition and the details of the explosion. Here we present the first study of a sample of high signal-to-noise ratio SN Ia spectra that extend blueward of 2900 A. We focus on spectra taken within 5 days of maximum brightness. Our sample of ten SNe Ia spans the majority of the parameter space of SN Ia optical diversity. We find that SNe Ia have significantly more diversity in the UV than in the optical, with the spectral variance continuing to increase with decreasing wavelengths until at least 1800 A (the limit of our data). The majority of the UV variance correlates with optical light-curve shape, while there are no obvious and unique correlations between spectral shape and either ejecta velocity or host-galaxy morphology. Using light-curve shape as the primary variable, we create a UV spectral model for SNe I...

  14. Legacy to the extreme

    NARCIS (Netherlands)

    A. van Deursen (Arie); T. Kuipers (Tobias); L.M.F. Moonen (Leon)

    2000-01-01

    textabstractWe explore the differences between developing a system using extreme programming techniques, and maintaining a legacy system. We investigate whether applying extreme programming techniques to legacy maintenance is useful and feasible.

  15. Legacy to the extreme

    NARCIS (Netherlands)

    Deursen, A. van; Kuipers, T.; Moonen, L.M.F.

    2000-01-01

    We explore the differences between developing a system using extreme programming techniques, and maintaining a legacy system. We investigate whether applying extreme programming techniques to legacy maintenance is useful and feasible.

  16. Extreme environment electronics

    CERN Document Server

    Cressler, John D

    2012-01-01

    Unfriendly to conventional electronic devices, circuits, and systems, extreme environments represent a serious challenge to designers and mission architects. The first truly comprehensive guide to this specialized field, Extreme Environment Electronics explains the essential aspects of designing and using devices, circuits, and electronic systems intended to operate in extreme environments, including across wide temperature ranges and in radiation-intense scenarios such as space. The Definitive Guide to Extreme Environment Electronics Featuring contributions by some of the world's foremost exp

  17. Deficiently Extremal Gorenstein Algebras

    Indian Academy of Sciences (India)

    Pavinder Singh

    2011-08-01

    The aim of this article is to study the homological properties of deficiently extremal Gorenstein algebras. We prove that if / is an odd deficiently extremal Gorenstein algebra with pure minimal free resolution, then the codimension of / must be odd. As an application, the structure of pure minimal free resolution of a nearly extremal Gorenstein algebra is obtained.

  18. Extreme value distributions

    CERN Document Server

    Ahsanullah, Mohammad

    2016-01-01

    The aim of the book is to give a through account of the basic theory of extreme value distributions. The book cover a wide range of materials available to date. The central ideas and results of extreme value distributions are presented. The book rwill be useful o applied statisticians as well statisticians interrested to work in the area of extreme value distributions.vmonograph presents the central ideas and results of extreme value distributions.The monograph gives self-contained of theory and applications of extreme value distributions.

  19. Molecular Dynamics in the Vacuum Ultraviolet

    Science.gov (United States)

    1989-01-30

    CLASSIFICATION OF THIS PAGE COMPLETED PROJECT SUMMARY TITLE: Molecular dynamics in the Vacuum Ultraviolet PRINCIPAL INVESTIGATOR: Paul L. Houston...DTIC TAB 0 Unannounced 0 By Distr ibution I Availability Codes Avail and I or Dist Special I Molecular Dynamics In the Vacuum Ultraviolet Final Technical...Further development of tunable vacuum ultraviolet sources has opened wide areas of molecular dynamics for study. Completed Research Photodissociation of

  20. High aspect ratio tungsten grating on ultrathin Si membranes for extreme UV lithography

    Science.gov (United States)

    Peng, Xinsheng; Ying, Yulong

    2016-09-01

    Extreme ultraviolet lithography is one of the modern lithography tools for high-volume manufacturing with 22 nm resolution and beyond. But critical challenges exist to the design and fabrication of large-scale and highly efficient diffraction transmission gratings, significantly reducing the feature sizes down to 22 nm and beyond. To achieve such a grating, the surface flatness, the line edge roughness, the transmission efficiency and aspect ratio should be improved significantly. Delachat et al (2015 Nanotechnology 26 108262) develop a full process to fabricate a tungsten diffraction grating on an ultrathin silicon membrane with higher aspect ratio up to 8.75 that met all the aforementioned requirements for extreme ultraviolet lithography. This process is fully compatible with standard industrial extreme ultraviolet lithography.