WorldWideScience

Sample records for environment lithography project

  1. Image-projection ion-beam lithography

    International Nuclear Information System (INIS)

    Miller, P.A.

    1989-01-01

    Image-projection ion-beam lithography is an attractive alternative for submicron patterning because it may provide high throughput; it uses demagnification to gain advantages in reticle fabrication, inspection, and lifetime; and it enjoys the precise deposition characteristics of ions which cause essentially no collateral damage. This lithographic option involves extracting low-mass ions (e.g., He + ) from a plasma source, transmitting the ions at low voltage through a stencil reticle, and then accelerating and focusing the ions electrostatically onto a resist-coated wafer. While the advantages of this technology have been demonstrated experimentally by the work of IMS (Austria), many difficulties still impede extension of the technology to the high-volume production of microelectronic devices. We report a computational study of a lithography system designed to address problem areas in field size, telecentricity, and chromatic and geometric aberration. We present a novel ion-column-design approach and conceptual ion-source and column designs which address these issues. We find that image-projection ion-beam technology should in principle meet high-volume-production requirements. The technical success of our present relatively compact-column design requires that a glow-discharge-based ion source (or equivalent cold source) be developed and that moderate further improvement in geometric aberration levels be obtained. Our system requires that image predistortion be employed during reticle fabrication to overcome distortion due to residual image nonlinearity and space-charge forces. This constitutes a software data preparation step, as do correcting for distortions in electron lithography columns and performing proximity-effect corrections. Areas needing further fundamental work are identified

  2. XUV free-electron laser-based projection lithography systems

    Energy Technology Data Exchange (ETDEWEB)

    Newnam, B.E.

    1990-01-01

    Free-electron laser sources, driven by rf-linear accelerators, have the potential to operate in the extreme ultraviolet (XUV) spectral range with more than sufficient average power for high-volume projection lithography. For XUV wavelengths from 100 nm to 4 nm, such sources will enable the resolution limit of optical projection lithography to be extended from 0.25 {mu}m to 0.05{mu}m and with an adequate total depth of focus (1 to 2 {mu}m). Recent developments of a photoinjector of very bright electron beams, high-precision magnetic undulators, and ring-resonator cavities raise our confidence that FEL operation below 100 nm is ready for prototype demonstration. We address the motivation for an XUV FEL source for commercial microcircuit production and its integration into a lithographic system, include reflecting reduction masks, reflecting XUV projection optics and alignment systems, and surface-imaging photoresists. 52 refs., 7 figs.

  3. Topology optimization for optical projection lithography with manufacturing uncertainties

    DEFF Research Database (Denmark)

    Zhou, Mingdong; Lazarov, Boyan Stefanov; Sigmund, Ole

    2014-01-01

    to manufacturing without additional optical proximity correction (OPC). The performance of the optimized device is robust toward the considered process variations. With the proposed unified approach, the design for photolithography is achieved by considering the optimal device performance and manufacturability......This article presents a topology optimization approach for micro-and nano-devices fabricated by optical projection lithography. Incorporating the photolithography process and the manufacturing uncertainties into the topology optimization process results in a binary mask that can be sent directly...

  4. Synchrotron radiation sources and condensers for projection x-ray lithography

    International Nuclear Information System (INIS)

    Murphy, J.B.; MacDowell, A.A.; White, D.L.; Wood, O.R. II

    1992-01-01

    The design requirements for a compact electron storage ring that could be used as a soft x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required to collect and condition the radiation in divergence, uniformity and direction to properly illuminate the mask and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft x-ray projection lithography system using an electron storage ring as a soft X-ray source are presented. It is shown that by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130 Angstrom photons for production line projection x-ray lithography is possible

  5. Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes

    NARCIS (Netherlands)

    E. Louis,; F. Bijkerk,; Shmaenok, L.; Voorma, H. J.; van der Wiel, M. J.; Schlatmann, R.; Verhoeven, J.; van der Drift, E. W. J. M.; Romijn, J.; Rousseeuw, B. A. C.; Voss, F.; Desor, R.; Nikolaus, B.

    1993-01-01

    In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources. fabrication of multilayer x-ray mirrors. and patterning of reflection masks. We are in the process of optimization of a

  6. Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect

    Directory of Open Access Journals (Sweden)

    Dongxu Ren

    2016-04-01

    Full Text Available A multi-repeated photolithography method for manufacturing an incremental linear scale using projection lithography is presented. The method is based on the average homogenization effect that periodically superposes the light intensity of different locations of pitches in the mask to make a consistent energy distribution at a specific wavelength, from which the accuracy of a linear scale can be improved precisely using the average pitch with different step distances. The method’s theoretical error is within 0.01 µm for a periodic mask with a 2-µm sine-wave error. The intensity error models in the focal plane include the rectangular grating error on the mask, static positioning error, and lithography lens focal plane alignment error, which affect pitch uniformity less than in the common linear scale projection lithography splicing process. It was analyzed and confirmed that increasing the repeat exposure number of a single stripe could improve accuracy, as could adjusting the exposure spacing to achieve a set proportion of black and white stripes. According to the experimental results, the effectiveness of the multi-repeated photolithography method is confirmed to easily realize a pitch accuracy of 43 nm in any 10 locations of 1 m, and the whole length accuracy of the linear scale is less than 1 µm/m.

  7. REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

    Science.gov (United States)

    McCord, Mark A.; Petric, Paul; Ummethala, Upendra; Carroll, Allen; Kojima, Shinichi; Grella, Luca; Shriyan, Sameet; Rettner, Charles T.; Bevis, Chris F.

    2012-03-01

    REBL (Reflective Electron Beam Lithography) is a novel concept for high speed maskless projection electron beam lithography. Originally targeting 45 nm HP (half pitch) under a DARPA funded contract, we are now working on optimizing the optics and architecture for the commercial silicon integrated circuit fabrication market at the equivalent of 16 nm HP. The shift to smaller features requires innovation in most major subsystems of the tool, including optics, stage, and metrology. We also require better simulation and understanding of the exposure process. In order to meet blur requirements for 16 nm lithography, we are both shrinking the pixel size and reducing the beam current. Throughput will be maintained by increasing the number of columns as well as other design optimizations. In consequence, the maximum stage speed required to meet wafer throughput targets at 16 nm will be much less than originally planned for at 45 nm. As a result, we are changing the stage architecture from a rotary design to a linear design that can still meet the throughput requirements but with more conventional technology that entails less technical risk. The linear concept also allows for simplifications in the datapath, primarily from being able to reuse pattern data across dies and columns. Finally, we are now able to demonstrate working dynamic pattern generator (DPG) chips, CMOS chips with microfabricated lenslets on top to prevent crosstalk between pixels.

  8. Accuracy and performance of 3D mask models in optical projection lithography

    Science.gov (United States)

    Agudelo, Viviana; Evanschitzky, Peter; Erdmann, Andreas; Fühner, Tim; Shao, Feng; Limmer, Steffen; Fey, Dietmar

    2011-04-01

    Different mask models have been compared: rigorous electromagnetic field (EMF) modeling, rigorous EMF modeling with decomposition techniques and the thin mask approach (Kirchhoff approach) to simulate optical diffraction from different mask patterns in projection systems for lithography. In addition, each rigorous model was tested for two different formulations for partially coherent imaging: The Hopkins assumption and rigorous simulation of mask diffraction orders for multiple illumination angles. The aim of this work is to closely approximate results of the rigorous EMF method by the thin mask model enhanced with pupil filtering techniques. The validity of this approach for different feature sizes, shapes and illumination conditions is investigated.

  9. On the similarities between micro/nano lithography and topology optimization projection methods

    DEFF Research Database (Denmark)

    Jansen, Miche; Lazarov, Boyan Stefanov; Schevenels, Mattias

    2013-01-01

    The aim of this paper is to incorporate a model for micro/nano lithography production processes in topology optimization. The production process turns out to provide a physical analogy for projection filters in topology optimization. Blueprints supplied by the designers cannot be directly used...... as inputs to lithographic processes due to the proximity effect which causes rounding of sharp corners and geometric interaction of closely spaced design elements. Therefore, topology optimization is applied as a tool for proximity effect correction. Furthermore, it is demonstrated that the robust...... projection filter can be used to account for uncertainties due to lithographic production processes which results in manufacturable blueprint designs and eliminates the need for subsequent corrections....

  10. Ion projection lithography: November 2000 status and sub-70-nm prospects

    Science.gov (United States)

    Kaesmaier, Rainer; Wolter, Andreas; Loeschner, Hans; Schunck, Stefan

    2000-10-01

    Among all next generation lithography (NGL) options Ion Projection Lithography (IPL) offers the smallest (particle) wavelength of 5x10- 5nm (l00keV Helium ions). Thus, 4x reduction ion-optics has diffraction limits IOS) has been realized and assembled. In parallel to the PDT-IOS effort, at Leica Jena a test bench for a vertical vacuum 300mm-wafer stage has been realized. Operation of magnetic bearing supported stage movement has already been demonstrated. As ASML vacuum compatible optical wafer alignment system, with 3nm(3(sigma) ) precision demonstrated in air, has been integrated to this wafer test bench system recently. Parallel to the IPL tool development, Infineon Technologies Mask House and the Institute for Microelectronics Stuttgart are intensively working on the development of IPL stencil masks with success in producing 150mm and 200mm stencil masks as reported elsewhere. This paper is focused on information about the status of the PDT-IOS tool.

  11. Large-area soft x-ray projection lithography using multilayer mirrors structured by RIE

    Science.gov (United States)

    Rahn, Steffen; Kloidt, Andreas; Kleineberg, Ulf; Schmiedeskamp, Bernt; Kadel, Klaus; Schomburg, Werner K.; Hormes, F. J.; Heinzmann, Ulrich

    1993-01-01

    SXPL (soft X-ray projection lithography) is one of the most promising applications of X-ray reflecting optics using multilayer mirrors. Within our collaboration, such multilayer mirrors were fabricated, characterized, laterally structured and then used as reflection masks in a projecting lithography procedure. Mo/Si-multilayer mirrors were produced by electron beam evaporation in UHV under thermal treatment with an in-situ X-ray controlled thickness in the region of 2d equals 14 nm. The reflectivities measured at normal incidence reached up to 54%. Various surface analysis techniques have been applied in order to characterize and optimize the X-ray mirrors. The multilayers were patterned by reactive ion etching (RIE) with CF(subscript 4), using a photoresist as the etch mask, thus producing X-ray reflection masks. The masks were tested in the synchrotron radiation laboratory of the electron accelerator ELSA at the Physikalisches Institut of Bonn University. A double crystal X-ray monochromator was modified so as to allow about 0.5 cm(superscript 2) of the reflection mask to be illuminated by white synchrotron radiation. The reflected patterns were projected (with an energy of 100 eV) onto the resist (Hoechst AZ PF 514), which was mounted at an average distance of about 7 mm. In the first test-experiments, structure sizes down to 8 micrometers were nicely reproduced over the whole of the exposed area. Smaller structures were distorted by Fresnel-diffraction. The theoretically calculated diffraction images agree very well with the observed images.

  12. Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system

    International Nuclear Information System (INIS)

    Xiu, K.; Gibson, J. M.

    2000-01-01

    We investigate the design for a scattering with angular limitation in projection electron-beam lithography (SCALPEL) based electron projection system with a demagnification of -4. By a ''field-flip'' process we can construct a doublet in which the magnetic field has a flat feature in most of the optic column but opposite sign at two sides connected by a sharp transition region. Such a theoretical model can give a near zero chromatic aberration of rotation and much smaller field curvature and astigmatism. Compared with the conventional doublet, the total image blur caused by aberrations at 1/√(2) mm off-axis distance and 1.5 mrad semiangle aperture at the mask side is about only 24 nm for a column length of 400 mm. A shorter column, less than the current 400 mm, is also favored for further reducing the total aberration. These guarantee that we can choose a much larger aperture angle (compared with present 0.5 mrad) and beam current density in such a SCALPEL projection system to achieve higher throughput while still maintaining current resolution. A practical issue for possible magnetic lens design is also discussed. (c) 2000 American Vacuum Society

  13. Integrated project support environments the ASPECT project

    CERN Document Server

    Brown, Alan W

    1991-01-01

    A major part of software engineering developments involve the use of computing tools which facilitate the management, maintenance, security, and building of long-scale software engineer projects. Consequently, there have been a proliferation of CASE tools and IPSES. This book looks at IPSES in general and the ASPECT project in particular, providing design and implementation details, as well as locating ASPECT in IPSE developments.Survey of integrated project support environments for more efficient software engineering**Description of a large scale IPSE--ASPECT**Evaluation of formal methods in

  14. EUV lithography

    CERN Document Server

    Bakshi, Vivek

    2018-01-01

    Extreme ultraviolet lithography (EUVL) is the principal lithography technology-beyond the current 193-nm-based optical lithography-aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography-light source, scanner, mask, mask handling, optics, optics metrology, resist, c...

  15. Measurement of low molecular weight silicon AMC to protect UV optics in photo-lithography environments

    Science.gov (United States)

    Lobert, Jürgen M.; Miller, Charles M.; Grayfer, Anatoly; Tivin, Anne M.

    2009-03-01

    A new analytical method for semiconductor-specific applications is presented for the accurate measurement of low molecular weight, silicon-containing, organic compounds TMS, HMDSO and D3. Low molecular weight / low boiling point silicon-containing compounds are not captured for extended periods of time by traditional chemical filters but have the same potential to degrade exposure tool optical surfaces as their high molecular weight counterparts. Likewise, we show that capturing these compounds on sample traps that are commonly used for organic AMC analysis does not work for various reasons. Using the analytical method described here, TMS, HMDSO and D3 can be measured artifact-free, with at least a 50:1 peak-to-noise ratio at the method detection limit, determined through the Hubaux-Vos method and satisfying a conservative 99% statistical confidence. Method detection limits for the compounds are 1-6 ppt in air. We present calibration curve, capacity, capture efficiency, break-through and repeatability data to demonstrate robustness of method. Seventy-one real-world samples from 26 projects taken in several fab environments show that TMS is found in concentrations 100 times higher than those of HMDSO and D3. All compounds are found in all environments in concentrations ranging from zero to 12 ppm, but most concentrations were below 50 ppb. All compounds are noticeably higher in litho-bays than in sub-fabs and we found all three compounds inside of two exposure tools, suggesting cleanroom and/or tool-internal contamination sources.

  16. Advanced engineering environment collaboration project.

    Energy Technology Data Exchange (ETDEWEB)

    Lamph, Jane Ann; Pomplun, Alan R.; Kiba, Grant W.; Dutra, Edward G.; Dankiewicz, Robert J.; Marburger, Scot J.

    2008-12-01

    The Advanced Engineering Environment (AEE) is a model for an engineering design and communications system that will enhance project collaboration throughout the nuclear weapons complex (NWC). Sandia National Laboratories and Parametric Technology Corporation (PTC) worked together on a prototype project to evaluate the suitability of a portion of PTC's Windchill 9.0 suite of data management, design and collaboration tools as the basis for an AEE. The AEE project team implemented Windchill 9.0 development servers in both classified and unclassified domains and used them to test and evaluate the Windchill tool suite relative to the needs of the NWC using weapons project use cases. A primary deliverable was the development of a new real time collaborative desktop design and engineering process using PDMLink (data management tool), Pro/Engineer (mechanical computer aided design tool) and ProductView Lite (visualization tool). Additional project activities included evaluations of PTC's electrical computer aided design, visualization, and engineering calculations applications. This report documents the AEE project work to share information and lessons learned with other NWC sites. It also provides PTC with recommendations for improving their products for NWC applications.

  17. Advanced engineering environment collaboration project

    International Nuclear Information System (INIS)

    Lamph, Jane Ann; Pomplun, Alan R.; Kiba, Grant W.; Dutra, Edward G.; Dankiewicz, Robert J.; Marburger, Scot J.

    2008-01-01

    The Advanced Engineering Environment (AEE) is a model for an engineering design and communications system that will enhance project collaboration throughout the nuclear weapons complex (NWC). Sandia National Laboratories and Parametric Technology Corporation (PTC) worked together on a prototype project to evaluate the suitability of a portion of PTC's Windchill 9.0 suite of data management, design and collaboration tools as the basis for an AEE. The AEE project team implemented Windchill 9.0 development servers in both classified and unclassified domains and used them to test and evaluate the Windchill tool suite relative to the needs of the NWC using weapons project use cases. A primary deliverable was the development of a new real time collaborative desktop design and engineering process using PDMLink (data management tool), Pro/Engineer (mechanical computer aided design tool) and ProductView Lite (visualization tool). Additional project activities included evaluations of PTC's electrical computer aided design, visualization, and engineering calculations applications. This report documents the AEE project work to share information and lessons learned with other NWC sites. It also provides PTC with recommendations for improving their products for NWC applications

  18. Advanced engineering environment pilot project.

    Energy Technology Data Exchange (ETDEWEB)

    Schwegel, Jill; Pomplun, Alan R.; Abernathy, Rusty (Parametric Technology Corporation, Needham, MA)

    2006-10-01

    The Advanced Engineering Environment (AEE) is a concurrent engineering concept that enables real-time process tooling design and analysis, collaborative process flow development, automated document creation, and full process traceability throughout a product's life cycle. The AEE will enable NNSA's Design and Production Agencies to collaborate through a singular integrated process. Sandia National Laboratories and Parametric Technology Corporation (PTC) are working together on a prototype AEE pilot project to evaluate PTC's product collaboration tools relative to the needs of the NWC. The primary deliverable for the project is a set of validated criteria for defining a complete commercial off-the-shelf (COTS) solution to deploy the AEE across the NWC.

  19. Reversible chemical patterning on stimuli-responsive polymer film: Environment-responsive lithography

    International Nuclear Information System (INIS)

    Ionov, Leonid; Minko, Sergiy; Stamm, Manfred; Gohy, Jean-Francois; Jerome, Robert; Scholl, Andreas

    2003-01-01

    We report on a novel type of chemical patterning based on thin stimuli-responsive polymer films. The basic concept is the permanent storage (writing) of a pattern, which is reversibly developed and erased upon exposure to appropriate environment, e.g., solvent, pH, and temperature. The smart surface is fabricated from the mixed brush of poly(2-vinylpyridine) and polyisoprene. The mixed brush demonstrates switching behavior upon exposure to different solvents. Cross-linking of polyisoprene via illumination through a photomask results in formation of patterns with suppressed switching. Due to the contrast in switching between illuminated and dark areas, exposure of the smart surface to different solvents causes either reversible formation or erasing of chemical contrast between the illuminated and dark areas. Thus, the pattern surface can very locally attract colloidal particles or can be wetted by water only upon exposure to the special solvent which introduces the contrast between the illuminated and dark areas. Appearance of the patterns indicates particular environment and can be used for local switching of adsorption

  20. Rapid biochemical functionalization of technical surfaces by means of a photobleaching-based maskless projection lithography process

    Science.gov (United States)

    Waldbaur, Ansgar; Waterkotte, Björn; Leuthold, Juerg; Schmitz, Katja; Rapp, Bastian E.

    2013-03-01

    MEMS/MOEMS based systems are increasingly applied in the biological and biomedical context, e.g. in form of biosensors or substrates for monitoring biological responses such as cell migration. For such applications, technical surfaces have to be provided with suitable biochemical functionalization. Typical functionalization procedures include wet-chemical techniques based on self-assembled monolayers of thiols on gold or silanes on glass. These processes create binary patterns and are often of limited use if spatially constrained non-binary patterns like surface bound biochemical gradients have to be provided. In order to create gradients or patterns, methods such as direct spotting or dip pen nanolithography can be used. Here, gradients can be emulated by varying the spot density or the concentration of the solutions employed. However, these methods are serial in nature and are thus of limited use if large surface areas have to be patterned. We present a technique to generate gradients of biochemical function by a photobleaching-based process allowing fast large-scale patterning. The process is based on photobleaching resulting in light-induced coupling of a fluorescently tagged biomolecule to a technical surface by concerted bleaching of the fluorophore. We custom designed a maskless projection lithography system based on a digital mirror device that allows the rapid creation of 8-bit grayscale protein patterns on any technical surface from digital data (e.g. bitmap files). We demonstrate how this process can be used to obtain patterns of several cm2 lateral size at micrometer resolution within minutes.

  1. Nano lithography

    CERN Document Server

    Landis, Stefan

    2013-01-01

    Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,

  2. Lithography for VLSI

    CERN Document Server

    Einspruch, Norman G

    1987-01-01

    VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods.This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6.

  3. MANAGE INTERESTED PARTIES IN PROJECT ENVIRONMENT

    Directory of Open Access Journals (Sweden)

    BILOKON A. I.

    2016-04-01

    Full Text Available The success or failure of the project often depends on factors which related to the environment, surrounded by the project and which are outside of the direct control of the project manager. The concept of the project environment, the processes of environmental analysis of the project and the ways in which managers can identify potential problems and develop a plan of action to ensure the success of the project. The management strategy the main factors of the environment includes both organizational forms and measures which aimed at the development process. For alignment of the organizational forms of communication manager must have a clear idea: what kind of interested persons and their actions (functions need to monitor, and in what form to maintain communication (bilateral relations of interdependence. This information is key to the further construction of the formal organization that supports interaction, the definition of its functions, competencies, allocation of roles, areas of responsibility, instructions, forms and methods of work. Purpose. Summarize, analyze and form an idea of the potential of existing approaches to the management of the project environment. Object of study. Management processes of the persons, who interested in the project environment. Subject of study. Methods and tools for the project management environment.

  4. D5.2 Project web environment

    OpenAIRE

    Fernie, Kate; Usher, Carol

    2011-01-01

    This deliverable presents a snapshot of the project web environment in July 2011. The project website http://www.digcur-education.org/eng was launched in month one of the project. The aim of this site is to provide information about the project to stakeholders and to related projects, as well as provide an Intranet for members of the project consortium. The website includes a ‘Join Us’ page to encourage interested parties to register as members of the DigCurV network, to receive the p...

  5. MATCHING CONFIGURATIONS PROJECTS OF COOPERATIVE MILK COLLECTION PROJECT ENVIRONMENT

    Directory of Open Access Journals (Sweden)

    Анатолій Миколайович ТРИГУБА

    2017-03-01

    Full Text Available The condition analysis of dairy farming is done and the reasons for its degradation are revealed. The need of technologically integrated production systems projects, harvesting, and processing of milk are substantiated. A scientific methodology and the method of project design of milk provision cooperative coordination in the community of the project environment, which are based on systematic-evaluative approach and simulation are proposed. The criterion for the definition of rational parameters of objects configuration for milk provision cooperative projects in the community system is the maximum value of their product. The monetary functioning assessment of the configuration object of cooperative milk provision projects in the community is done. On the basis of the proposed method, we performed the coordination of project configuration of milk provision cooperative with the project environment of territory Zabolotsi community in Brody district of Lviv region.

  6. Metrology for Grayscale Lithography

    International Nuclear Information System (INIS)

    Murali, Raghunath

    2007-01-01

    Three dimensional microstructures find applications in diffractive optical elements, photonic elements, etc. and can be efficiently fabricated by grayscale lithography. Good process control is important for achieving the desired structures. Metrology methods for grayscale lithography are discussed. Process optimization for grayscale e-beam lithography is explored and various process parameters that affect the grayscale process are discussed

  7. Low-energy electron beam proximity projection lithography (LEEPL): the world's first e-beam production tool, LEEPL 3000

    Science.gov (United States)

    Behringer, Uwe F. W.

    2004-06-01

    In June 2000 ago the company Accretech and LEEPL corporation decided to develop an E-beam lithography tool for high throughput wafer exposure, called LEEPL. In an amazing short time the alpha tool was built. In 2002 the beta tool was installed at Accretech. Today the first production tool the LEEPL 3000 is ready to be shipped. The 2keV E-beam tool will be used in the first lithography strategy to expose (in mix and match mode with optical exposure tools) critical levels like gate structures, contact holes (CH), and via pattern of the 90 nm and 65 nm node. At the SEMATECH EPL workshop on September 22nd in Cambridge, England it was mentioned that the amount of these levels will increase very rapidly (8 in 2007; 13 in 2010 and 17 in 2013). The schedule of the production tool for 45 nm node is mid 2005 and for the 32 nm node 2008. The Figure 1 shows from left to right α-tool, the β-tool and the production tool LEEPL 3000. Figure 1 also shows the timetable of the 4 LEEPL forum all held in Japan.

  8. SOR Lithography in West Germany

    Science.gov (United States)

    Heuberger, Anton

    1989-08-01

    The 64 Mbit DRAM will represent the first generation of integrated circuits which cannot be produced reasonably by means of optical lithography techniques. X-ray lithography using synchrotron radiation seems to be the most promising method in overcoming the problems in the sub-0.5 micron range. The first year of production of the 64 Mbit DRAM will be 1995 or 1996. This means that X-ray lithography has to show its applicability in an industrial environment by 1992 and has to prove that the specifications of a 64 Mbit DRAM technology can actually be achieved. Part of this task is a demonstration of production suitable equipment such as the X-ray stepper, including an appropriate X-ray source and measurement and inspection tools. The most important bottlenecks on the way toward reaching these goals are linked to the 1 x scale mask technology, especially the pattern definition accuracy and zero level of printing defects down to the order of magnitude of 50 nm. Specifically, fast defect detection methods on the basis of high resolution e-beam techniques and repair methods have to be developed. The other problems of X-ray lithography, such as high quality single layer X-ray resists, X-ray sources and stepper including alignment are either well on the way or are already solved.

  9. UMTRA Project: Environment, Safety, and Health Plan

    International Nuclear Information System (INIS)

    1995-02-01

    The US Department of Energy has prepared this UMTRA Project Environment, Safety, and Health (ES and H) Plan to establish the policy, implementing requirements, and guidance for the UMTRA Project. The requirements and guidance identified in this plan are designed to provide technical direction to UMTRA Project contractors to assist in the development and implementation of their ES and H plans and programs for UMTRA Project work activities. Specific requirements set forth in this UMTRA Project ES and H Plan are intended to provide uniformity to the UMTRA Project's ES and H programs for processing sites, disposal sites, and vicinity properties. In all cases, this UMTRA Project ES and H Plan is intended to be consistent with applicable standards and regulations and to provide guidance that is generic in nature and will allow for contractors' evaluation of site or contract-specific ES and H conditions. This plan specifies the basic ES and H requirements applicable to UMTRA Project ES and H programs and delineates responsibilities for carrying out this plan. DOE and contractor ES and H personnel are expected to exercise professional judgment and apply a graded approach when interpreting these guidelines, based on the risk of operations

  10. Atom lithography of Fe

    NARCIS (Netherlands)

    Sligte, te E.; Smeets, B.; van der Stam, K.M.R.; Herfst, R.W.; Straten, van der P.; Beijerinck, H.C.W.; Leeuwen, van K.A.H.

    2004-01-01

    Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to

  11. Laser Interference Lithography

    NARCIS (Netherlands)

    van Wolferen, Hendricus A.G.M.; Abelmann, Leon; Hennessy, Theodore C.

    In this chapter we explain how submicron gratings can be prepared by Laser Interference Lithography (LIL). In this maskless lithography technique, the standing wave pattern that exists at the intersection of two coherent laser beams is used to expose a photosensitive layer. We show how to build the

  12. Project communication management in complex environments

    CERN Document Server

    Ying, Zhong

    2014-01-01

    This unique book that deals with project communication management in complex environments, taking a leaf from China’s experience with a major earthquake in Sichuan, would be a timely contribution to fill this lacuna. Readers would be able to understand how companies and organizations that are unprepared for crisis management would react to their detriment. The lessons provided in this book are the only one of its kind to highlight the lessons for companies and organizations to prepare themselves for successful project communication management through the complexity-informed framework. Although the book is written by two building professionals, the concepts and lessons presented are generic and equally applicable for businesses outside of the construction industry; for example, for airports, resorts, hotels, shipyards, etc.

  13. The environment of the Olympic Dam project

    International Nuclear Information System (INIS)

    Anon.

    1989-01-01

    The Olympic Dam uranium/copper/gold project at Roxby Downs, South Australia, has a harsh environment with high summer temperatures, low rainfall and poor quality soils. There are no natural water courses. The vegetation is dominated by annual grasses in summer and wildflowers in winter. Red kangaroos are the most commonly sighted native mammals. The Fat-tailed Dunnart a nocturnal carniverous marsupial, is found. Eighty three bird species have been recorded. Reptiles are numerous and one amphibian occurs. A vermin eradication program aimed at rabbit control is conducted. ills

  14. Domestic offset projects in the built environment

    Energy Technology Data Exchange (ETDEWEB)

    Oikonomou, V.; Spijker, E.; Van der Gaast, W. [Joint Implementation Network, Laan Corpus den Hoorn 300, 9728JT Groningen (Netherlands); Flamos, A.; Spyridaki, N.A. [Department of Industrial Management, University of Piraeus, Karaoli and Dimitriou 80 Str, 185 34 Piraeus (Greece)

    2012-08-15

    Emission reduction activities in the European Union (EU) in- and outside the European Trading System (ETS) thus far have largely taken place separately. One possibility to combine the two is through linking Non-ETS offset project-based crediting schemes in the form of Joint Implementation or domestic offset (DO) projects with the EU ETS. Linking would allow non-ETS offset project-based CO2 credits to be traded within the ETS market. This paper discusses the merits and drawbacks of the implementation of a DO scheme in the built environment in the Netherlands. The built environment can be characterised as a sector with a great diversity and significant energy savings potential. Emphasis is paid on the modalities for estimating energy savings under DO projects. The authors discuss if next to existing EU, national or regional policies in the Netherlands, DO could spur initiatives in sub-sectors or market areas that are difficult to reach with conventional policy instruments. Thus, despite the existing policy framework in this sector, there could be still space for DO to reach the untapped energy savings potential. DO can support activities and technologies that are not covered by other policy instruments, either because they are not part of the instruments focus or are above the minimum requirements of the incumbent policy targets. It is expected that some lessons from this study in the Netherlands can be taken into account also by other countries facing similar market circumstances, which have implemented several policy instruments and are considering DO schemes as an alternative for capturing part of the untapped energy saving potential in their end use sectors. Another possible advantage of DO is that it has the potential to reduce public spending on existing policy goals, when it is considered in conjunction with existing public financing instruments. In order to tap into this potential, there are a series of hurdles in place, like additionality and the current CO2

  15. North Central Project: Environment act proposal

    International Nuclear Information System (INIS)

    1992-05-01

    Manitoba Hydro proposes to construct a power transmission and distribution line system to connect 12 northern Manitoba communities to the utility's central power grid. The purpose of this North Central Project (NCP) is to provide reliable and unrestricted electric service to remote communities now largely receiving limited diesel-generated power. The NCP is composed of a 138-kV transmission line running ca 350 km from the Kelsey Generating Station, ca 160 km of 25-kV distribution lines, new transformer stations at four communities, upgraded internal distribution systems within the communities, removal of existing diesel stations and restoration of the sites, modifications and additions to the Kelsey switchyard, and a communications system. The NCP is described in detail, including proposed line routes and transformer station locations, rationales for site and route selection, projected impacts on the environment and local societies, and consultations with the communities to be affected. Potential impacts are expected to be modest, with few unmitigable adverse impacts and a number of potentially significant positive benefits. Impact management measures are proposed to prevent or mitigate adverse effects and to create or enhance positive impacts such as local employment of native peoples. 49 figs., 1 tab

  16. Maskless, resistless ion beam lithography

    Energy Technology Data Exchange (ETDEWEB)

    Ji, Qing [Univ. of California, Berkeley, CA (United States)

    2003-01-01

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O2+, BF2+, P+ etc., for surface modification and doping applications. With optimized source condition, around 85% of BF2+, over 90% of O2+ and P+ have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He+ beam is as high as 440 A/cm2 • Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O2+ ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O2+ ions with the dose of 1015 cm-2. The oxide can then serve as a hard mask for patterning of the Si film. The

  17. Maskless, resistless ion beam lithography

    International Nuclear Information System (INIS)

    Ji, Qing

    2003-01-01

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O 2 + , BF 2 + , P + etc., for surface modification and doping applications. With optimized source condition, around 85% of BF 2 + , over 90% of O 2 + and P + have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He + beam is as high as 440 A/cm 2 · Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O 2 + ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O 2 + ions with the dose of 10 15 cm -2 . The oxide can then serve as a hard mask for patterning of the Si film. The process flow and the experimental results for directly patterned poly-Si features are presented. The formation of shallow pn-junctions in bulk silicon wafers by scanning focused P

  18. Managing Complex Distance Education Projects in a Telework Environment

    Science.gov (United States)

    Ally, Mohamed; Cleveland-Innes, Marti; Wiseman, Colin

    2010-01-01

    The advances of communication technologies have allowed professionals to work on distance education projects in a telework environment. Managers of these projects must have the skills to manage the projects from a distance. They must be able to select the appropriate team members to work on the project, orient team members, and monitor team…

  19. Workshop on compact storage ring technology: applications to lithography

    International Nuclear Information System (INIS)

    1986-01-01

    Project planning in the area of x-ray lithography is discussed. Three technologies that are emphasized are the light source, the lithographic technology, and masking technology. The needs of the semiconductor industry in the lithography area during the next decade are discussed, particularly as regards large scale production of high density dynamic random access memory devices. Storage ring parameters and an overall exposure tool for x-ray lithography are addressed. Competition in this area of technology from Germany and Japan is discussed briefly. The design of a storage ring is considered, including lattice design, magnets, and beam injection systems

  20. Electron-beam lithography

    International Nuclear Information System (INIS)

    Harriott, L.; Liddle, A.

    1997-01-01

    As part of a commemorative series of articles to mark the hundredth anniversary of the discovery of the electron, this article describes the use of electron beams to write features on silicon wafers. Recent advances in electron beam lithography, as it is known, could enable this technology to be used for the mass manufacture of silicon chips. The validation of space-charge optimization and evaluation of printing techniques is underway. (UK)

  1. Electron beam lithography

    International Nuclear Information System (INIS)

    Harriott, L.; Liddle, A.

    1997-01-01

    As part of a commemorative series of articles to mark the hundredth anniversary of the discovery of the electron, this article describes the use of electron beams to write features on silicon wafers. Recent advances in electron beam lithography, as it is known, could enable this technology to be used for the mass manufacture of silicon chips. The validation of space-charge optimization and evaluation of printing techniques is underway. 5 figs

  2. Partnership project between Environment Canada and ECRC

    International Nuclear Information System (INIS)

    Duhaime, C.; Daigle, R.

    1996-01-01

    The partnership agreement between Environment Canada and Eastern Canada Response Ltd, (ECRC) which allows for rapid release of information to all levels of management in the event of an oil or chemical spill, was discussed. A geographic information system for emergency management, and an information sharing network is made available to all parties through Internet to assure a continuous exchange of information during an emergency. Mapping, surveying and information-exchange tools are designed for mutual integration and compatibility. The agreement was signed at the beginning of 1996 and the new system will be tested by occasional exercises beginning in September 1996. Modifications will be made as necessary. 5 figs

  3. A virtual therapeutic environment with user projective agents.

    Science.gov (United States)

    Ookita, S Y; Tokuda, H

    2001-02-01

    Today, we see the Internet as more than just an information infrastructure, but a socializing place and a safe outlet of inner feelings. Many personalities develop aside from real world life due to its anonymous environment. Virtual world interactions are bringing about new psychological illnesses ranging from netaddiction to technostress, as well as online personality disorders and conflicts in multiple identities that exist in the virtual world. Presently, there are no standard therapy models for the virtual environment. There are very few therapeutic environments, or tools especially made for virtual therapeutic environments. The goal of our research is to provide the therapy model and middleware tools for psychologists to use in virtual therapeutic environments. We propose the Cyber Therapy Model, and Projective Agents, a tool used in the therapeutic environment. To evaluate the effectiveness of the tool, we created a prototype system, called the Virtual Group Counseling System, which is a therapeutic environment that allows the user to participate in group counseling through the eyes of their Projective Agent. Projective Agents inherit the user's personality traits. During the virtual group counseling, the user's Projective Agent interacts and collaborates to recover and increase their psychological growth. The prototype system provides a simulation environment where psychologists can adjust the parameters and customize their own simulation environment. The model and tool is a first attempt toward simulating online personalities that may exist only online, and provide data for observation.

  4. Scientific projection paper for ecosystems and environment

    International Nuclear Information System (INIS)

    Gustafson, P.

    1980-01-01

    The pervasiveness of concern about ionizing radiation in the public mind stems, in considerable measure, from a lack of understanding about the behavior, fate, and presumed effects of radiation-emitting elements. This lack of understanding also is applicable to the standards and guidelines which are used to regulate the quantities of radionuclides which may be released to the environment. Radioecological research on the transport, movement, and effects of ionizing radiation is needed to verify the validity of the standards for release and to eliminate the potential errors that currently exist in assessing dose to human populations due to uncertainties in the environmental transport of radionuclides in terrestrial and aquatic ecosystems. We believe that the public concern over the impact of ionizing radiation (and therefore nuclear energy) could be alleviated considerably by directing more of our radiobiologic research effort to scientific questions related to standards and standard setting

  5. How Does a Project Manager's Level of Development Influence Conceptualizations of Project Management and the Project Development Environment?

    Science.gov (United States)

    Lynch, Margaret M.

    2013-01-01

    This study explores the meaning project managers (PMs) make of their project environment, how they lead their teams and have incorporate complexity into their project management approach. The exploration of the PM's developmental level and meaning making offers a different angle on the project management and leadership literature. The study…

  6. Clean solutions to the incoming wafer quality impact on lithography process yield limits in a dynamic copper/low-k research and development environment

    Science.gov (United States)

    Lysaght, Patrick S.; Ybarra, Israel; Sax, Harry; Gupta, Gaurav; West, Michael; Doros, Theodore G.; Beach, James V.; Mello, Jim

    2000-06-01

    The continued growth of the semiconductor manufacturing industry has been due, in large part, to improved lithographic resolution and overlay across increasingly larger chip areas. Optical lithography continues to be the mainstream technology for the industry with extensions of optical lithography being employed to support 180 nm product and process development. While the industry momentum is behind optical extensions to 130 nm, the key challenge will be maintaining an adequate and affordable process latitude (depth of focus/exposure window) necessary for 10% post-etch critical dimension (CD) control. If the full potential of optical lithography is to be exploited, the current lithographic systems can not be compromised by incoming wafer quality. Impurity specifications of novel Low-k dielectric materials, plating solutions, chemical-mechanical planarization (CMP) slurries, and chemical vapor deposition (CVD) precursors are not well understood and more stringent control measures will be required to meet defect density targets as identified in the National Technology Roadmap for Semiconductors (NTRS). This paper identifies several specific poor quality wafer issues that have been effectively addressed as a result of the introduction of a set of flexible and reliable wafer back surface clean processes developed on the SEZ Spin-Processor 203 configured for processing of 200 mm diameter wafers. Patterned wafers have been back surface etched by means of a novel spin process contamination elimination (SpCE) technique with the wafer suspended by a dynamic nitrogen (N2) flow, device side down, via the Bernoulli effect. Figure 1 illustrates the wafer-chuck orientation within the process chamber during back side etch processing. This paper addresses a number of direct and immediate benefits to the MicraScan IIITM deep-ultraviolet (DUV) step-and-scan system at SEMATECH. These enhancements have resulted from the resolution of three significant problems: (1) back surface

  7. Embodied agents in virtual environments: The Aveiro project

    NARCIS (Netherlands)

    Leiviska, K.; Heylen, Dirk K.J.; Nijholt, Antinus; Poel, Mannes

    2001-01-01

    We present current and envisaged work on the AVEIRO project of our research group concerning virtual environments inhabited by autonomous embodied agents. These environments are being built for researching issues in human-computer interactions and intelligent agent applications. We describe the

  8. X-ray lithography

    International Nuclear Information System (INIS)

    Malek, C.K.

    1989-01-01

    Any type of lithography is a means of printing a pattern. The suitable lithographic tool is defined according to what kind of application the replication technique is aimed at, that is to say, what size of pattern, on what type of substrate and how many substrates are desired. The trend in all the fields of science and fabrication is to go towards smaller dimensions. Especially in the case of advanced device fabrication in the semiconductor industry, the reduction of dimensions results in a higher density of integrated circuits that will result in lower cost per function and improved performance. Lithography is used to define areas that are usually protected by a resist pattern in relief on a substrate and is followed by a process which transfers the aerial pattern from the resist to the bulk substrate as, for example, in microelectronics, in between two steps of the process or levels that are used for selective diffusion of impurities to produce the desired electrical characteristics, etching, metallization

  9. Evolving Our Evaluation of Lighting Environments Project

    Science.gov (United States)

    Terrier, Douglas; Clayton, Ronald; Clark, Toni Anne

    2016-01-01

    Imagine you are an astronaut on their 100th day of your three year exploration mission. During your daily routine to the small hygiene compartment of the spacecraft, you realize that no matter what you do, your body blocks the light from the lamp. You can clearly see your hands or your toes but not both! What were those design engineers thinking! It would have been nice if they could have made the walls glow instead! The reason the designers were not more innovative is that their interpretation of the system lighting requirements didn't allow them to be so! Currently, our interior spacecraft lighting standards and requirements are written around the concept of a quantity of light illuminating a spacecraft surface. The natural interpretation for the engineer is that a lamp that throws light to the surface is required. Because of certification costs, only one lamp is designed and small rooms can wind up with lamps that may be inappropriate for the room architecture. The advances in solid state light emitting technologies and optics for lighting and visual communication necessitates the evaluation of how NASA envisions spacecraft lighting architectures and how NASA uses industry standards for the design and evaluation of lighting system. Current NASA lighting standards and requirements for existing architectures focus on the separate ability of a lighting system to throw light against a surface or the ability of a display system to provide the appropriate visual contrast. Realization that these systems can be integrated is not realized. The result is that the systems are developed independent from one another and potential efficiencies that could be realized from borrowing from the concept of one technology and applying it for the purpose of the other does not occur. This project investigated the possibility of incorporating large luminous surface lamps as an alternative or supplement to overhead lighting. We identified existing industry standards for architectural

  10. 32nm 1-D regular pitch SRAM bitcell design for interference-assisted lithography

    Science.gov (United States)

    Greenway, Robert T.; Jeong, Kwangok; Kahng, Andrew B.; Park, Chul-Hong; Petersen, John S.

    2008-10-01

    As optical lithography advances into the 45nm technology node and beyond, new manufacturing-aware design requirements have emerged. We address layout design for interference-assisted lithography (IAL), a double exposure method that combines maskless interference lithography (IL) and projection lithography (PL); cf. hybrid optical maskless lithography (HOMA) in [2] and [3]. Since IL can generate dense but regular pitch patterns, a key challenge to deployment of IAL is the conversion of existing designs to regular-linewidth, regular-pitch layouts. In this paper, we propose new 1-D regular pitch SRAM bitcell layouts which are amenable to IAL. We evaluate the feasibility of our bitcell designs via lithography simulations and circuit simulations, and confirm that the proposed bitcells can be successfully printed by IAL and that their electrical characteristics are comparable to those of existing bitcells.

  11. Creating a Project-Based Learning Environment to Improve Project Management Skills of Graduate Students

    Science.gov (United States)

    Arantes do Amaral, Joao Alberto; Gonçalves, Paulo; Hess, Aurélio

    2015-01-01

    This article describes the project-based learning environment created to support project management graduate courses. The paper will focus on the learning context and procedures followed for 13 years, in 47 project-based learning MBA courses, involving approximately 1,400 students and 34 community partners.

  12. Health and Environment Project In Benin

    Directory of Open Access Journals (Sweden)

    Raphaël Edou

    2010-02-01

    Full Text Available In 1989, the Republic of Benin was facing great social and economic upheavals. In 1990, the Canadian and American Mennonite missionaries created the Bethesda Health Care Centre.  In 1993, assessment of the hospital activities showed that many people were coming back to the centre repeatedly with the same illnesses linked to sanitation aspects and living conditions. The Community Development and Environmental Protection Department (DCAM was thus established to face this great challenge. It quickly helped the community and the local authorities to establish a waste management system.  The Programme for Sanitation and Protection of the Environment (PrAPE was designed and funded by the French Embassy and Evangelische Entwicklungsdienst V.e (EED, a German Christian organization. Households then began to subscribe for the collection of their wastes. Bethesda began to assist other communities to put in place waste management systems. Today, it is working throughout the country with many municipalities. While the programme was being implemented, we discovered that the community needed to be supported in their revenue generating activities. We set up in 1996, a solidarity-based microfinance system. The savings of some people were used to grant credit to others. This community bank has developed into a large bank today. In 2006, a system of mutual insurance was put in place. A complete integrated system to address the basic needs of the community was thus set up.En 1989, la République du Bénin a été confrontée à d’importants bouleversements sociaux et économiques. En 1990, des missionnaires mennonites canadiens et américains ont créé le Centre de santé Bethesda. En 1993, l’évaluation des activités hospitalières a montré que de nombreuses personnes revenaient à plusieurs reprises au centre avec les mêmes maladies liées à des problèmes d’assainissement et aux conditions de vie. Le département Développement Communautaire et

  13. RESEARCH ON COMPLEX, LARGE INDUSTRIAL PROJECTS IN TRANSNATIONAL ENVIRONMENT

    Directory of Open Access Journals (Sweden)

    Florin POPESCU

    2016-12-01

    Full Text Available More and more projects from different industrial sectors developed in transnational environment are becoming more characterized as "complex". In recent years, there has been much discussion and controversy about the complexity of the projects, and, despite what has been written and said in various papers, journals and professional conferences, more confusion than clarification was created, complexity of projects being interpreted differently from one author to another. Most of the literature studied is based on linear, analytical and rational approach, focusing on the size of project management planning and control and actually less on projects that are characterized as taking place and grow into a dynamic socio-human environment in a continuous change. This study represents a critical review of existing theoretical models found in literature, highlighting their limitations. The output of this literature study represents an integration of different approaches concerning complexity under one umbrella to provide a common understanding of the evolution of this concept.

  14. [Nuclear energy and environment: review of the IAEA environmental projects].

    Science.gov (United States)

    Fesenko, S; Fogt, G

    2012-01-01

    The review of the environmental projects of the International Atomic Energy Agency is presented. Basic IAEA documents intended to protect humans and the Environment are considered and their main features are discussed. Some challenging issues in the area of protection of the Environment and man, including the impact of nuclear facilities on the environment, radioactive waste management, and remediation of the areas affected by radiological accidents, nuclear testing and sites of nuclear facilities are also discussed. The need to maintain the existing knowledge in radioecology and protection of the environment is emphasised.

  15. Programmable imprint lithography template

    Science.gov (United States)

    Cardinale, Gregory F [Oakland, CA; Talin, Albert A [Livermore, CA

    2006-10-31

    A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.

  16. Surface enhanced thermo lithography

    KAUST Repository

    Coluccio, Maria Laura

    2017-01-13

    We used electroless deposition to fabricate clusters of silver nanoparticles (NPs) on a silicon substrate. These clusters are plasmonics devices that induce giant electromagnetic (EM) field increments. When those EM field are absorbed by the metal NPs clusters generate, in turn, severe temperature increases. Here, we used the laser radiation of a conventional Raman set-up to transfer geometrical patterns from a template of metal NPs clusters into a layer of thermo sensitive Polyphthalaldehyde (PPA) polymer. Temperature profile on the devices depends on specific arrangements of silver nanoparticles. In plane temperature variations may be controlled with (i) high nano-meter spatial precision and (ii) single Kelvin temperature resolution on varying the shape, size and spacing of metal nanostructures. This scheme can be used to generate strongly localized heat amplifications for applications in nanotechnology, surface enhanced thermo-lithography (SETL), biology and medicine (for space resolved cell ablation and treatment), nano-chemistry.

  17. Surface enhanced thermo lithography

    KAUST Repository

    Coluccio, Maria Laura; Alabastri, Alessandro; Bonanni, Simon; Majewska, Roksana; Dattoli, Elisabetta; Barberio, Marianna; Candeloro, Patrizio; Perozziello, Gerardo; Mollace, Vincenzo; Di Fabrizio, Enzo M.; Gentile, Francesco

    2017-01-01

    We used electroless deposition to fabricate clusters of silver nanoparticles (NPs) on a silicon substrate. These clusters are plasmonics devices that induce giant electromagnetic (EM) field increments. When those EM field are absorbed by the metal NPs clusters generate, in turn, severe temperature increases. Here, we used the laser radiation of a conventional Raman set-up to transfer geometrical patterns from a template of metal NPs clusters into a layer of thermo sensitive Polyphthalaldehyde (PPA) polymer. Temperature profile on the devices depends on specific arrangements of silver nanoparticles. In plane temperature variations may be controlled with (i) high nano-meter spatial precision and (ii) single Kelvin temperature resolution on varying the shape, size and spacing of metal nanostructures. This scheme can be used to generate strongly localized heat amplifications for applications in nanotechnology, surface enhanced thermo-lithography (SETL), biology and medicine (for space resolved cell ablation and treatment), nano-chemistry.

  18. Interference lithography for optical devices and coatings

    Science.gov (United States)

    Juhl, Abigail Therese

    Interference lithography can create large-area, defect-free nanostructures with unique optical properties. In this thesis, interference lithography will be utilized to create photonic crystals for functional devices or coatings. For instance, typical lithographic processing techniques were used to create 1, 2 and 3 dimensional photonic crystals in SU8 photoresist. These structures were in-filled with birefringent liquid crystal to make active devices, and the orientation of the liquid crystal directors within the SU8 matrix was studied. Most of this thesis will be focused on utilizing polymerization induced phase separation as a single-step method for fabrication by interference lithography. For example, layered polymer/nanoparticle composites have been created through the one-step two-beam interference lithographic exposure of a dispersion of 25 and 50 nm silica particles within a photopolymerizable mixture at a wavelength of 532 nm. In the areas of constructive interference, the monomer begins to polymerize via a free-radical process and concurrently the nanoparticles move into the regions of destructive interference. The holographic exposure of the particles within the monomer resin offers a single-step method to anisotropically structure the nanoconstituents within a composite. A one-step holographic exposure was also used to fabricate self-healing coatings that use water from the environment to catalyze polymerization. Polymerization induced phase separation was used to sequester an isocyanate monomer within an acrylate matrix. Due to the periodic modulation of the index of refraction between the monomer and polymer, the coating can reflect a desired wavelength, allowing for tunable coloration. When the coating is scratched, polymerization of the liquid isocyanate is catalyzed by moisture in air; if the indices of the two polymers are matched, the coatings turn transparent after healing. Interference lithography offers a method of creating multifunctional self

  19. Kikori River basin project to sustain environment alongside development

    International Nuclear Information System (INIS)

    Price, J.B.; Power, A.P.; Henry, D.

    1994-01-01

    Protecting people and the environment is an essential design and operational criteria for the Kutubu Petroleum Development Project to minimize the physical, social and economic impacts on the local people and their environment in Papua New Guinea. This paper describes how Kutubu was implemented, and how World Wildlife Fund is assisting the neighboring communities to utilize their natural resources for long term benefit. The objectives and first year expectations of a three year integrated conservation and development project are identified, and the progress is summarized

  20. An approach to the relationship, environment-project-administration

    International Nuclear Information System (INIS)

    Angel Sanin, Enrique

    1999-01-01

    Interdisciplinary groups working in environmental management, have to deal with three different problems, understanding the regional environment in which the project will be implemented, estimating the environmental impacts and devising the environmental management plan (EMP). These three realities environment, project and management are loosely defined, their limits are not clear and, therefore, several things are mean by the same word. In this article, an attempt to express these three realities in a language with some mathematical rigor is presented, looking for precision in their meaning. Some pertinent conclusions regarding environmental management are derived from the mathematical attempt

  1. Process competencies in a problem and project based learning environment

    DEFF Research Database (Denmark)

    Du, Xiangyun; Kolmos, Anette

    2006-01-01

    with the expected professional competencies. Based on the educational practice of PBL Aalborg Model, which is characterized by problem-orientation, project-organization and team work, this paper examines the process of developing process competencies through studying engineering in a PBL environment from...... process competencies through doing problem and project based work in teams? 2) How do students perceive their achievement of these process competencies?......Future engineers are not only required to master technological competencies concerning solving problems, producing and innovating technology, they are also expected to have capabilities of cooperation, communication, and project management in diverse social context, which are referred to as process...

  2. Project Selection in the Design Studio: Absence of Learning Environments

    Science.gov (United States)

    Basa, Inci

    2010-01-01

    Project selection is an essential matter of design teaching. Based on observations of a specific curriculum, the author claims that a wide repertoire of subjects including offices, restaurants, hotels, and other public places are used to prepare design students, but that schools and other "learning environments/ schools" are similarly…

  3. Human-Robot Teamwork in USAR Environments: The TRADR Project

    NARCIS (Netherlands)

    Greeff, J. de; Hindriks, K.; Neerincx, M.A.; Kruijff-Korbayova, I.

    2015-01-01

    The TRADR project aims at developing methods and models for human-robot teamwork, enabling robots to operate in search and rescue environments alongside humans as teammates, rather than as tools. Through a user-centered cognitive engineering method, human-robot teamwork is analyzed, modeled,

  4. CAMCE: An Environment to Support Multimedia Courseware Projects.

    Science.gov (United States)

    Barrese, R. M.; And Others

    1992-01-01

    Presents results of CAMCE (Computer-Aided Multimedia Courseware Engineering) project research concerned with definition of a methodology to describe a systematic approach for multimedia courseware development. Discussion covers the CAMCE methodology, requirements of an advanced authoring environment, use of an object-based model in the CAMCE…

  5. Advanced Engineering Environment FY09/10 pilot project.

    Energy Technology Data Exchange (ETDEWEB)

    Lamph, Jane Ann; Kiba, Grant W.; Pomplun, Alan R.; Dutra, Edward G.; Sego, Abraham L.

    2010-06-01

    The Advanced Engineering Environment (AEE) project identifies emerging engineering environment tools and assesses their value to Sandia National Laboratories and our partners in the Nuclear Security Enterprise (NSE) by testing them in our design environment. This project accomplished several pilot activities, including: the preliminary definition of an engineering bill of materials (BOM) based product structure in the Windchill PDMLink 9.0 application; an evaluation of Mentor Graphics Data Management System (DMS) application for electrical computer-aided design (ECAD) library administration; and implementation and documentation of a Windchill 9.1 application upgrade. The project also supported the migration of legacy data from existing corporate product lifecycle management systems into new classified and unclassified Windchill PDMLink 9.0 systems. The project included two infrastructure modernization efforts: the replacement of two aging AEE development servers for reliable platforms for ongoing AEE project work; and the replacement of four critical application and license servers that support design and engineering work at the Sandia National Laboratories/California site.

  6. Quantum lithography beyond the diffraction limit via Rabi-oscillations

    Science.gov (United States)

    Liao, Zeyang; Al-Amri, Mohammad; Zubairy, M. Suhail

    2011-03-01

    We propose a quantum optical method to do the sub-wavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi-oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. This method is expected to be realizable using current technology. This work is supported by a grant from the Qatar National Research Fund (QNRF) under the NPRP project and a grant from the King Abdulaziz City for Science and Technology (KACST).

  7. The partial coherence modulation transfer function in testing lithography lens

    Science.gov (United States)

    Huang, Jiun-Woei

    2018-03-01

    Due to the lithography demanding high performance in projection of semiconductor mask to wafer, the lens has to be almost free in spherical and coma aberration, thus, in situ optical testing for diagnosis of lens performance has to be established to verify the performance and to provide the suggesting for further improvement of the lens, before the lens has been build and integrated with light source. The measurement of modulation transfer function of critical dimension (CD) is main performance parameter to evaluate the line width of semiconductor platform fabricating ability for the smallest line width of producing tiny integrated circuits. Although the modulation transfer function (MTF) has been popularly used to evaluation the optical system, but in lithography, the contrast of each line-pair is in one dimension or two dimensions, analytically, while the lens stand along in the test bench integrated with the light source coherent or near coherent for the small dimension near the optical diffraction limit, the MTF is not only contributed by the lens, also by illumination of platform. In the study, the partial coherence modulation transfer function (PCMTF) for testing a lithography lens is suggested by measuring MTF in the high spatial frequency of in situ lithography lens, blended with the illumination of partial and in coherent light source. PCMTF can be one of measurement to evaluate the imperfect lens of lithography lens for further improvement in lens performance.

  8. Fabrication of periodically ordered diamond nanostructures by microsphere lithography

    Czech Academy of Sciences Publication Activity Database

    Domonkos, Mária; Ižák, Tibor; Štolcová, L.; Proška, J.; Kromka, Alexander

    2014-01-01

    Roč. 251, č. 12 (2014), s. 2587-2592 ISSN 0370-1972 R&D Projects: GA ČR(CZ) GBP108/12/G108 Institutional support: RVO:68378271 Keywords : CVD growth * diamond * microsphere lithography * selective area deposition Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.489, year: 2014

  9. Investigation of the physics of diamond MEMS : diamond allotrope lithography

    International Nuclear Information System (INIS)

    Zalizniak, I.; Olivero, P.; Jamieson, D.N.; Prawer, S.; Reichart, P.; Rubanov, S.; Petriconi, S.

    2005-01-01

    We propose a novel lithography process in which ion induced phase transfomations of diamond form sacrificial layers allowing the fabrication of small structures including micro-electromechanical systems (MEMS). We have applied this novel lithography to the fabrication of diamond microcavities, cantilevers and optical waveguides. In this paper we present preliminary experiments directed at the fabrication of suspended diamond disks that have the potential for operation as optical resonators. Such structures would be very durable and resistant to chemical attack with potential applications as novel sensors for extreme environments or high temperature radiation detectors. (author). 3 refs., 3 figs

  10. From 2D Lithography to 3D Patterning

    NARCIS (Netherlands)

    Van Zeijl, H.W.; Wei, J.; Shen, C.; Verhaar, T.M.; Sarro, P.M.

    2010-01-01

    Lithography as developed for IC device fabrication is a high volume high accuracy patterning technology with strong 2 dimensional (2D) characteristics. This 2D nature makes it a challenge to integrate this technology in a 3 dimensional (3D) manufacturing environment. This article addresses the

  11. Photoinhibition superresolution lithography

    Science.gov (United States)

    Forman, Darren Lawrence

    While the prospect of nanoscale manufacturing has generated tremendous excitement, arbitrary patterning at nanometer length scales cannot be brought about with current photolithography---the technology that for decades has driven electronics miniaturization and enabled mass production of digital logic, memory, MEMS and flat-panel displays. This is due to the relatively long wavelength of light and diffraction, which imposes a physical not technological limit on the resolution of a far-field optical pattern. Photoinhibited superresolution (PInSR) lithography is a new scheme designed to beat the diffraction limit through two-color confinement of photopolymerization and, via efficient single-photon absorption kinetics, also be high-throughput capable. This thesis describes development of an integrated optical and materials system for investigating spatiotemporal dynamics of photoinhibited superresolution lithography, with a demonstrated 3x superresolution beyond the diffraction limit. The two-color response, arising from orthogonal photogeneration of species that participate in competing reactions, is shown to be highly complex. This is both a direct and indirect consequence of mobility. Interesting trade-offs arise: thin-film resins (necessitated by single-photon absorption kinetics) require high viscosity for film stability, but the photoinhibition effect is suppressed in viscous resins. Despite this apparent suppression, which can be overcome with high excitation of the photoinhibition system, the low mobility afforded by viscous materials is beneficial for confinement of active species. Diffusion-induced blurring of patterned photoinhibition is problematic in a resin with viscosity = 1,000 cP, and overcome in a resin with viscosity eta = 500,000 cP. Superresolution of factor 3x beyond the diffraction limit is demonstrated at 0.2 NA, with additional results indicating superresolution ability at 1.2 NA. Investigating the effect of diminished photoinhibition efficacy

  12. Towards a Collaborative Open Environment of Project-Centred Learning

    DEFF Research Database (Denmark)

    Bongio, Aldo; van Bruggen, Jan; Ceri, Stefano

    Nowadays, engineering studies are characterized by high mobility of students, lecturers and workforce and by the dynamics of multinational companies where “classes” or “students’ teams” composed of persons with different competencies and backgrounds, working together in projects to solve complex ...... environment. This paper proposes a COOPER framework and shows its approaches to address the various research challenges. This work is partially supported by EU/IST FP6 STREP project COOPER (contract number IST-2005-027073).......Nowadays, engineering studies are characterized by high mobility of students, lecturers and workforce and by the dynamics of multinational companies where “classes” or “students’ teams” composed of persons with different competencies and backgrounds, working together in projects to solve complex...

  13. Human Activity Recognition in AAL Environments Using Random Projections

    Directory of Open Access Journals (Sweden)

    Robertas Damaševičius

    2016-01-01

    Full Text Available Automatic human activity recognition systems aim to capture the state of the user and its environment by exploiting heterogeneous sensors attached to the subject’s body and permit continuous monitoring of numerous physiological signals reflecting the state of human actions. Successful identification of human activities can be immensely useful in healthcare applications for Ambient Assisted Living (AAL, for automatic and intelligent activity monitoring systems developed for elderly and disabled people. In this paper, we propose the method for activity recognition and subject identification based on random projections from high-dimensional feature space to low-dimensional projection space, where the classes are separated using the Jaccard distance between probability density functions of projected data. Two HAR domain tasks are considered: activity identification and subject identification. The experimental results using the proposed method with Human Activity Dataset (HAD data are presented.

  14. Human Activity Recognition in AAL Environments Using Random Projections.

    Science.gov (United States)

    Damaševičius, Robertas; Vasiljevas, Mindaugas; Šalkevičius, Justas; Woźniak, Marcin

    2016-01-01

    Automatic human activity recognition systems aim to capture the state of the user and its environment by exploiting heterogeneous sensors attached to the subject's body and permit continuous monitoring of numerous physiological signals reflecting the state of human actions. Successful identification of human activities can be immensely useful in healthcare applications for Ambient Assisted Living (AAL), for automatic and intelligent activity monitoring systems developed for elderly and disabled people. In this paper, we propose the method for activity recognition and subject identification based on random projections from high-dimensional feature space to low-dimensional projection space, where the classes are separated using the Jaccard distance between probability density functions of projected data. Two HAR domain tasks are considered: activity identification and subject identification. The experimental results using the proposed method with Human Activity Dataset (HAD) data are presented.

  15. Overview of ISTC projects related to the environment

    International Nuclear Information System (INIS)

    Meyer, U.

    2002-01-01

    The field of ENVIRONMENT is the largest of the 14 technology areas within the International Science and Technology Center (ISTC). As of June 2000, more than 160 environmental projects have been selected for funding; this equals about 19% of all approved ISTC projects, one of the highest of all ISTC application areas. Provided funds total about US $55 million, 22% of the ISTC's allocated budget. The statistics verify that ENVIRONMENT is the most active technical area in reviews and funding in the ISTC. In general terms, this fact documents the strong interest of the financing parties in environmental purposes and indicates their desire to support the effort in the development of improved processes and innovative technologies for the solution of urgent environmental problems and for their future prevention in the CIS. The content and objectives of the approved projects include the following topics: Radioactive Waste Treatment and Disposal, Monitoring and Instrumentation, Modeling and Risk Assessment, Remediation and Decontamination, Environmental Health and Safety, Seismic Monitoring, and Pollution of Air and Water. The projects are devoted to nuclear and nonnuclear environmental issues in similar proportion. (author)

  16. SOLERAS - Solar Controlled Environment Agriculture Project. Final report, Volume 1. Project summary

    Energy Technology Data Exchange (ETDEWEB)

    1985-12-30

    A summary of the Solar Controlled Environment Agriculture Project is presented. The design of the greenhouses include transparent double pane glass roof with channels for fluid between the panes, inner pane tinted and double pane extruded acrylic aluminized mylar shade and diffuser. Solar energy technologies provide power for water desalination, for pumping irrigation water, and for cooling and heating the controlled environment space so that crops can grow in arid lands. The project is a joint effort between the United States and Saudi Arabia. (BCS)

  17. The ALIVE Project: Astronomy Learning in Immersive Virtual Environments

    Science.gov (United States)

    Yu, K. C.; Sahami, K.; Denn, G.

    2008-06-01

    The Astronomy Learning in Immersive Virtual Environments (ALIVE) project seeks to discover learning modes and optimal teaching strategies using immersive virtual environments (VEs). VEs are computer-generated, three-dimensional environments that can be navigated to provide multiple perspectives. Immersive VEs provide the additional benefit of surrounding a viewer with the simulated reality. ALIVE evaluates the incorporation of an interactive, real-time ``virtual universe'' into formal college astronomy education. In the experiment, pre-course, post-course, and curriculum tests will be used to determine the efficacy of immersive visualizations presented in a digital planetarium versus the same visual simulations in the non-immersive setting of a normal classroom, as well as a control case using traditional classroom multimedia. To normalize for inter-instructor variability, each ALIVE instructor will teach at least one of each class in each of the three test groups.

  18. Wafer-shape metrics based foundry lithography

    Science.gov (United States)

    Kim, Sungtae; Liang, Frida; Mileham, Jeffrey; Tsai, Damon; Bouche, Eric; Lee, Sean; Huang, Albert; Hua, C. F.; Wei, Ming Sheng

    2017-03-01

    As device shrink, there are many difficulties with process integration and device yield. Lithography process control is expected to be a major challenge due to tighter overlay and focus control requirement. The understanding and control of stresses accumulated during device fabrication has becoming more critical at advanced technology nodes. Within-wafer stress variations cause local wafer distortions which in turn present challenges for managing overlay and depth of focus during lithography. A novel technique for measuring distortion is Coherent Gradient Sensing (CGS) interferometry, which is capable of generating a high-density distortion data set of the full wafer within a time frame suitable for a high volume manufacturing (HVM) environment. In this paper, we describe the adoption of CGS (Coherent Gradient Sensing) interferometry into high volume foundry manufacturing to overcome these challenges. Leveraging this high density 3D metrology, we characterized its In-plane distortion as well as its topography capabilities applied to the full flow of an advanced foundry manufacturing. Case studies are presented that summarize the use of CGS data to reveal correlations between in-plane distortion and overlay variation as well as between topography and device yield.

  19. CONSTRUCTION PROJECTS VERSUS THE PROTECTION OF NATURE AND ENVIRONMENT

    Directory of Open Access Journals (Sweden)

    Elżbieta Hanna Szafranko

    2017-02-01

    Full Text Available Construction investments are related to the economic development of each country. Expansion of towns and settlements, construction, industrial, commercial and recreational objects and the communication network is necessary and results from regional development strategies. For their implementation it is necessary to prepare the area designated for their development. In many regions of our country area suitable for construction are increasingly limited, and furthermore investors often looks for an attractive investment location. For this reason, more and more construction projects dangerously close to areas of high natural value and protected and often are entering the these areas. To minimize the negative investment impact on the environment there are developed several variants of investment. Next, assessing the positive and negative effects, we choose the best, from the point of view of the surrounding environment solution. To illustrate the procedure example of analysis using the method proposed by the author, the indicator is shown.

  20. ENVIRONMENT PROTECTION AND ENVIRONMENT MONITORING ISSUES IN THE PROJECTS OF SUBGLACIAL LAKES STUDIES IN ANTARCTICA

    Directory of Open Access Journals (Sweden)

    I. A. Alekhina

    2012-01-01

    Full Text Available Antarctic subglacial lakes can represent extreme natural habitats for microorganisms from the position of their evolution and adaptation, as well as they can contain the information on Antarctic ice sheet history and climatic changes in their sediments. Now only direct measurements and sampling from these habitats can answer on many fundamental questions. Special precaution should be complied at penetration into these unique relic environments without unfavorable impacts and contamination. A number of recommendations were developed on levels of cleanliness and sterility during direct exploration and research of subglacial environments. Documents considered in the article are the first and necessary steps for appropriate and long-term ecological management of subglacial Antarctic environments. Today there are three projects of subglacial aquatic environment research which are in preparation and realization – the Russian project of Lake Vostok, the similar British project of Lake Ellsworth and the American project on Whillans Ice Stream. The programs of ecological stewardship for direct exploration of these lakes are discussed. All these subglacial aquatic objects of further exploration and research are so various on their structure, age and regime, that only results of all programs as a whole can help to draw us a uniform picture of a subglacial ecological system. Ecological stewardship of these should provide the minimal ecological impact with maximal scientific results. On the basis of existing documents and recommendations the general approaches and the program of ecological stewardship for Lake Vostok research are discussed. Study of drilling fluid, drilling chips, Vostok ice core and the fresh frozen water will allow to make an assessment of biological and chemical contamination as a result of the first penetration and to modify the further stewardship program for the second penetration and direct exploration of lake water.

  1. Interference Lithography for Vertical Photovoltaics

    Science.gov (United States)

    Balls, Amy; Pei, Lei; Kvavle, Joshua; Sieler, Andrew; Schultz, Stephen; Linford, Matthew; Vanfleet, Richard; Davis, Robert

    2009-10-01

    We are exploring low cost approaches for fabricating three dimensional nanoscale structures. These vertical structures could significantly improve the efficiency of devices made from low cost photovoltaic materials. The nanoscale vertical structure provides a way to increase optical absorption in thin photovoltaic films without increasing the electronic carrier separation distance. The target structure is a high temperature transparent template with a dense array of holes on a 400 - 600 nm pitch fabricated by a combination of interference lithography and nanoembossing. First a master was fabricated using ultraviolet light interference lithography and the pattern was transferred into a silicon wafer master by silicon reactive ion etching. Embossing studies were performed with the master on several high temperature polymers.

  2. Photonic integrated circuits: new challenges for lithography

    Science.gov (United States)

    Bolten, Jens; Wahlbrink, Thorsten; Prinzen, Andreas; Porschatis, Caroline; Lerch, Holger; Giesecke, Anna Lena

    2016-10-01

    In this work routes towards the fabrication of photonic integrated circuits (PICs) and the challenges their fabrication poses on lithography, such as large differences in feature dimension of adjacent device features, non-Manhattan-type features, high aspect ratios and significant topographic steps as well as tight lithographic requirements with respect to critical dimension control, line edge roughness and other key figures of merit not only for very small but also for relatively large features, are highlighted. Several ways those challenges are faced in today's low-volume fabrication of PICs, including the concept multi project wafer runs and mix and match approaches, are presented and possible paths towards a real market uptake of PICs are discussed.

  3. Nanoimprint lithography for microfluidics manufacturing

    Science.gov (United States)

    Kreindl, Gerald; Matthias, Thorsten

    2013-12-01

    The history of imprint technology as lithography method for pattern replication can be traced back to 1970's but the most significant progress has been made by the research group of S. Chou in the 1990's. Since then, it has become a popular technique with a rapidly growing interest from both research and industrial sides and a variety of new approaches have been proposed along the mainstream scientific advances. Nanoimprint lithography (NIL) is a novel method for the fabrication of micro/nanometer scale patterns with low cost, high throughput and high resolution. Unlike traditional optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional lithographic techniques. The ability to fabricate structures from the micro- to the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of micro- and nanotechnology and the biotech- sciences as a whole and will be discussed in this paper. Nanoimprinting can not only create resist patterns, as in lithography, but can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

  4. Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

    NARCIS (Netherlands)

    Zhao, Yiping; Berenschot, Johan W.; de Boer, M.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt

    2008-01-01

    The fabrication of a stamp reinforced with silicon nitride is presented for its use in nanoimprint lithography. The fabrication process is based on edge lithography using conventional optical lithography and wet anisotropic etching of 110 silicon wafers. SiO2 nano-ridges of 20 nm in width were

  5. Lithography requirements in complex VLSI device fabrication

    International Nuclear Information System (INIS)

    Wilson, A.D.

    1985-01-01

    Fabrication of complex very large scale integration (VLSI) circuits requires continual advances in lithography to satisfy: decreasing minimum linewidths, larger chip sizes, tighter linewidth and overlay control, increasing topography to linewidth ratios, higher yield demands, increased throughput, harsher device processing, lower lithography cost, and a larger part number set with quick turn-around time. Where optical, electron beam, x-ray, and ion beam lithography can be applied to judiciously satisfy the complex VLSI circuit fabrication requirements is discussed and those areas that are in need of major further advances are addressed. Emphasis will be placed on advanced electron beam and storage ring x-ray lithography

  6. Protein assay structured on paper by using lithography

    Science.gov (United States)

    Wilhelm, E.; Nargang, T. M.; Al Bitar, W.; Waterkotte, B.; Rapp, B. E.

    2015-03-01

    There are two main challenges in producing a robust, paper-based analytical device. The first one is to create a hydrophobic barrier which unlike the commonly used wax barriers does not break if the paper is bent. The second one is the creation of the (bio-)specific sensing layer. For this proteins have to be immobilized without diminishing their activity. We solve both problems using light-based fabrication methods that enable fast, efficient manufacturing of paper-based analytical devices. The first technique relies on silanization by which we create a flexible hydrophobic barrier made of dimethoxydimethylsilane. The second technique demonstrated within this paper uses photobleaching to immobilize proteins by means of maskless projection lithography. Both techniques have been tested on a classical lithography setup using printed toner masks and on a lithography system for maskless lithography. Using these setups we could demonstrate that the proposed manufacturing techniques can be carried out at low costs. The resolution of the paper-based analytical devices obtained with static masks was lower due to the lower mask resolution. Better results were obtained using advanced lithography equipment. By doing so we demonstrated, that our technique enables fabrication of effective hydrophobic boundary layers with a thickness of only 342 μm. Furthermore we showed that flourescine-5-biotin can be immobilized on the non-structured paper and be employed for the detection of streptavidinalkaline phosphatase. By carrying out this assay on a paper-based analytical device which had been structured using the silanization technique we proofed biological compatibility of the suggested patterning technique.

  7. Low Cost Lithography Tool for High Brightness LED Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Andrew Hawryluk; Emily True

    2012-06-30

    The objective of this activity was to address the need for improved manufacturing tools for LEDs. Improvements include lower cost (both capital equipment cost reductions and cost-ofownership reductions), better automation and better yields. To meet the DOE objective of $1- 2/kilolumen, it will be necessary to develop these highly automated manufacturing tools. Lithography is used extensively in the fabrication of high-brightness LEDs, but the tools used to date are not scalable to high-volume manufacturing. This activity addressed the LED lithography process. During R&D and low volume manufacturing, most LED companies use contact-printers. However, several industries have shown that these printers are incompatible with high volume manufacturing and the LED industry needs to evolve to projection steppers. The need for projection lithography tools for LED manufacturing is identified in the Solid State Lighting Manufacturing Roadmap Draft, June 2009. The Roadmap states that Projection tools are needed by 2011. This work will modify a stepper, originally designed for semiconductor manufacturing, for use in LED manufacturing. This work addresses improvements to yield, material handling, automation and throughput for LED manufacturing while reducing the capital equipment cost.

  8. Design for manufacturability with advanced lithography

    CERN Document Server

    Yu, Bei

    2016-01-01

    This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

  9. Seamless-merging-oriented parallel inverse lithography technology

    International Nuclear Information System (INIS)

    Yang Yiwei; Shi Zheng; Shen Shanhu

    2009-01-01

    Inverse lithography technology (ILT), a promising resolution enhancement technology (RET) used in next generations of IC manufacture, has the capability to push lithography to its limit. However, the existing methods of ILT are either time-consuming due to the large layout in a single process, or not accurate enough due to simply block merging in the parallel process. The seamless-merging-oriented parallel ILT method proposed in this paper is fast because of the parallel process; and most importantly, convergence enhancement penalty terms (CEPT) introduced in the parallel ILT optimization process take the environment into consideration as well as environmental change through target updating. This method increases the similarity of the overlapped area between guard-bands and work units, makes the merging process approach seamless and hence reduces hot-spots. The experimental results show that seamless-merging-oriented parallel ILT not only accelerates the optimization process, but also significantly improves the quality of ILT.

  10. A PERSPECTIVE ON PRIORITIZATION IN PROJECT PORTFOLIO ENVIRONMENT

    OpenAIRE

    Eberhardt, Henrik; Lindblom, David

    2011-01-01

    The overbridging aspect of this interpretative master thesis is the implementation of a project prioritizing strategy. The concept is subdivided into three processes and entities, which could be seen as tools; project management office(PMO), project evaluation and project selection, which in turn are discussed separately. The thesis investigates how the tools impact the prioritizing strategy and why a company must follow a certain prioritizing strategy. The primary focus has been an IS/IT dep...

  11. Dark Matter in Galaxy Clusters: Shape, Projection, and Environment

    Science.gov (United States)

    Groener, Austen M.

    is highly variable depending upon the reconstruction technique used. We also find concentrations derived from dark matter only simulations (at approximately Mvir ˜ 1014 M[special characters omitted]) to be inconsistent with the WL and WL+SL relations at the 1sigma level, even after the projection of triaxial halos is taken into account. However, to fully determine consistency between simulations and observations, a volume-limited sample of clusters is required, as selection effects become increasingly more important in answering this. Interestingly, we also find evidence for a steeper WL+SL relation as compared to WL alone, a result which could perhaps be caused by the varying shape of cluster isodensities, though most likely reflects differences in selection effects caused by these two techniques. Lastly, we compare concentration and mass measurements of individual clusters made using more than one technique, highlighting the magnitude of the potential bias which could exist in such observational samples. Finally, we explore the large-scale environment around galaxy clusters using spectroscopically confirmed galaxies from the Sloan Digital Sky Survey (SDSS) Data Release 10. We correlate the angular structure of the distribution of galaxies (out to a distance of $mathrm{10h-1, Mpc) around 92 galaxy clusters with their corresponding mass and concentration measurements. We find that the orientation of the cluster environment on this scale has little impact on the value of cluster measurements.

  12. NPD project portfolio selection using reinvestment strategy in competitive environment

    Directory of Open Access Journals (Sweden)

    Alireza Ghassemi

    2018-01-01

    Full Text Available This study aims to design a new model for selecting most fitting new product development projects in a pool of projects. To catch the best model, we assume new products will be introduced to the competitive markets. Also, we suppose the revenue yielded by completed projects can be reinvested on implementation of other projects. Other sources of financing are borrowing loans from banks and initial capital of the firm. These limited resources determine most evaluated projects to be performed. Several types of interactions among different projects are considered to make the chosen projects more like a portfolio. In addition, some numerical examples from the real world are provided to demonstrate the applicability of the proposed model. These examples show how the particular considerations in the suggested model affect the results.

  13. Project management competency factors in the built environment

    OpenAIRE

    2013-01-01

    M.Comm. (Business Management) Project failures worldwide are still significantly high, despite the availability of project management frameworks, standards, techniques and methodologies. A project’s success is, in part, contingent on effectively managing the constraints of time, costs and performance, and in order to achieve this, it is essential for the project manager to possess and display appropriate competencies. The problem addressed in this study is to gain understanding of the proj...

  14. THE QUALITY IMPORTANCE IN A PROJECT MANAGEMENT COMPLEXITY ENVIRONMENT

    OpenAIRE

    Adrian UNGUREANU; Anca VARGA

    2009-01-01

    A project is a temporary endeaver undertaken to creat a unique product, service or result. The temporary nature of project indicates a definite beginning and end. The end is reached when the project’s objectives have been achieved or when the project is terminated becouse its objectives will not or cannot be met, when the need for the project no longer exist. Temporary does not necessarily mean short in duration. Temporary does not generally apply to the product, service, or result created by...

  15. Traditional Project Management and the Visual Workplace Environment to Improve Project Success

    Science.gov (United States)

    Fichera, Christopher E.

    2016-01-01

    A majority of large IT projects fail to meet scheduled deadlines, are over budget and do not satisfy the end user. Many projects fail in spite of utilizing traditional project management techniques. Research of project management has not identified the use of a visual workspace as a feature affecting or influencing the success of a project during…

  16. Resistless Fabrication of Nanoimprint Lithography (NIL Stamps Using Nano-Stencil Lithography

    Directory of Open Access Journals (Sweden)

    Juergen Brugger

    2013-10-01

    Full Text Available In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.

  17. Challenges of anamorphic high-NA lithography and mask making

    Science.gov (United States)

    Hsu, Stephen D.; Liu, Jingjing

    2017-06-01

    Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10

  18. Integrated Environment and Safety and Health Management System (ISMS) Implementation Project Plan

    Energy Technology Data Exchange (ETDEWEB)

    MITCHELL, R.L.

    2000-01-10

    The Integrated Environment, Safety and Health Management System (ISMS) Implementation Project Plan serves as the project document to guide the Fluor Hanford, Inc (FHI) and Major Subcontractor (MSC) participants through the steps necessary to complete the integration of environment, safety, and health into management and work practices at all levels.

  19. Integrated Environment and Safety and Health Management System (ISMS) Implementation Project Plan

    International Nuclear Information System (INIS)

    MITCHELL, R.L.

    2000-01-01

    The Integrated Environment, Safety and Health Management System (ISMS) Implementation Project Plan serves as the project document to guide the Fluor Hanford, Inc (FHI) and Major Subcontractor (MSC) participants through the steps necessary to complete the integration of environment, safety, and health into management and work practices at all levels

  20. Final report investigation project agricultural products and environment

    International Nuclear Information System (INIS)

    Loria, L.G.; Jimenez Dam, R.; Mora Rodriguez, P.

    1998-01-01

    The document presents the after-action report on six investigation projects: Thermoluminescence, Spectrometry gamma of low level, Agricultural products, Radon in the subsoil, Nuclear instrumentation, and X-ray fluorescence, executed between 1995-1997 by the Laboratory of Physical Nuclear Applied of the University of Costa Rica, in the which objectives are shown, applied methodology as well as the achievements and results each project. (Author) [es

  1. FY 2000 report on the results of the regional consortium R and D project - Regional consortium energy R and D. Development of new vacuum ultraviolet area optical materials realizing next generation short wavelength optical lithography; 2000 nendo chiiki consortium kenkyu kaihatsu jigyo - chiiki consortium energy kenkyu kaihatsu. Jisedai tanhacho hikari lithography wo jitsugensuru shinku shigaiiki kogaku zairyo no kaihatsu seika hokokusho

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2001-03-01

    As materials for next generation lithography use optical device using short wavelength light sources such as F{sub 2} and Ar{sub 2}, the development was proceeded with of fluoride monocrystal materials and 12-inch class large/high quality monocrystal production technology. Studies were made in the following five fields: 1) proposal/design of new materials and the heightening of performance: 2) establishment of the large/high quality crystal production method; 3) evaluation of optical properties and elucidation of micro-defect formation mechanism; 4) comprehensive investigational research; 5) study of the evaluation technology by vacuum ultraviolet area pulse light. In 1), for the development of the optimum materials, a lot of materials were tried to be monocrystallized, and the permeability was estimated by measuring the reflectance in the vacuum ultraviolet area. As to LiCaAlF{sub 6}, monocrystal with 1-inch diameter was made by the Bridgman method. In 2), studies were made of conditions for large crystal growth by the pull method, large crystal growth by the Bridgman method, and the structure of production equipment for crystals with larger diameter. (NEDO)

  2. Fast or Smart? How the Use of Scrum Can Influence the Temporal Environment in a Project

    DEFF Research Database (Denmark)

    Scheller, Vibeke Kristine; Hvid, Helge Søndergaard; Pries-Heje, Jan

    2015-01-01

    A recent survey shows that 40% of all projects use, or have used, agile methods. The most commonly used agile method is Scrum, one reason being that Scrum provides mechanisms for building a healthy temporal environment for the project participants. Through a case study carried out in a Danish...... municipality we demkonstrate how the tgemporal environment in a project is influenced - enhanced as well as challenged - by the use of Scrum....

  3. Project InterActions: A Multigenerational Robotic Learning Environment

    Science.gov (United States)

    Bers, Marina U.

    2007-12-01

    This paper presents Project InterActions, a series of 5-week workshops in which very young learners (4- to 7-year-old children) and their parents come together to build and program a personally meaningful robotic project in the context of a multigenerational robotics-based community of practice. The goal of these family workshops is to teach both parents and children about the mechanical and programming aspects involved in robotics, as well as to initiate them in a learning trajectory with and about technology. Results from this project address different ways in which parents and children learn together and provide insights into how to develop educational interventions that would educate parents, as well as children, in new domains of knowledge and skills such as robotics and new technologies.

  4. Personalized learning Ecologies in Problem and Project Based Learning Environments

    DEFF Research Database (Denmark)

    Rongbutsri, Nikorn; Ryberg, Thomas; Zander, Pär-Ola

    2012-01-01

    is in contrast to an artificial learning setting often found in traditional education. As many other higher education institutions, Aalborg University aims at providing learning environments that support the underlying pedagogical approach employed, and which can lead to different online and offline learning.......g. coordination, communication, negotiation, document sharing, calendars, meetings and version control. Furthermore, the pedagogical fabric of LMSs/VLEs have recently been called into question and critiqued by proponents of Personal Learning Environments (PLEs)(Ryberg, Buus, & Georgsen, 2011) . In sum....... making it important to understand and conceptualise students’ use of technology. Ecology is the study of relationship between organisms in an environment which is the set of circumstances surrounding that organism. Learning ecologies are the study of the relationship of a learner or a group of learners...

  5. Aviation Safety Program Atmospheric Environment Safety Technologies (AEST) Project

    Science.gov (United States)

    Colantonio, Ron

    2011-01-01

    Engine Icing: Characterization and Simulation Capability: Develop knowledge bases, analysis methods, and simulation tools needed to address the problem of engine icing; in particular, ice-crystal icing Airframe Icing Simulation and Engineering Tool Capability: Develop and demonstrate 3-D capability to simulate and model airframe ice accretion and related aerodynamic performance degradation for current and future aircraft configurations in an expanded icing environment that includes freezing drizzle/rain Atmospheric Hazard Sensing and Mitigation Technology Capability: Improve and expand remote sensing and mitigation of hazardous atmospheric environments and phenomena

  6. Successful project teams (in R&D environment)

    CSIR Research Space (South Africa)

    Giesler, Achmed

    2011-09-01

    Full Text Available management tools no longer give project teams a competitive edge - additional qualitative tools are required, following a systems approach. A paradigm shift away from the traditional triangle of budget, brief and time towards a stronger focus on people issues...

  7. Combined e-beam lithography using different energies

    Czech Academy of Sciences Publication Activity Database

    Krátký, Stanislav; Kolařík, Vladimír; Horáček, Miroslav; Meluzín, Petr; Král, Stanislav

    2017-01-01

    Roč. 177, JUN (2017), s. 30-34 ISSN 0167-9317 R&D Projects: GA TA ČR TE01020233; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : grayscale e-beam lithography * mix and match process * absorbed energy density * resist sensitivity * micro-optical elements Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering OBOR OECD: Nano-processes (applications on nano-scale) Impact factor: 1.806, year: 2016

  8. Knowledge Management in a Project Environment: Organisational CT and Project Influences

    OpenAIRE

    Polyaninova, Taya

    2011-01-01

    During a project implementation various forms of information and experience are generated within the organization. If this accumulated knowledge is not recorded and shared amongst other projects, this knowledge will be lost and no longer be available to assist future projects. This may lead to increased future projects costs as resources, time and money will be wasted on redefining the knowledge that once existed within the company. By not capturing and redeploying this knowledge, the quality...

  9. Masks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y.

    1998-01-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed

  10. Power demand operation - environment and potential. Proposals for main project

    International Nuclear Information System (INIS)

    Wathne, M.

    1995-01-01

    This report discusses proposals for a main project on environmental and other problems arising when hydroelectric power stations supply energy at gigawatt levels. The project aims in particular to identify environmental problems where too little is known today for proper planning of this type of operation. The proposals emphasize the consequences which cannot be adequately analysed in terms of current techniques. These techniques presuppose steady state conditions. One proposal concerns market terms for power sales. Other proposals deal with hydrological data and uncertainty, capacity of watercourses, ice and temperature, aquatic eco-systems, erosion, supersaturation of water with air, flooding and dam breaks, impact on climate, inflow of fresh water in fjords and impact on algae. 33 refs., 4 tabs

  11. The STRIVE-ONR Project: Stress Resistance in Virtual Environments

    Science.gov (United States)

    2015-07-29

    from the Virtual Iraq/Afghanistan Virtual Reality Exposure Therapy (VRET) system at the University of Southern California Institute for Creative...better sense of health outcomes; that is, "how the social environment exerts a cumulative impact on the physical and mental well being of individuals...levels with functional decline in elderly men and women. Geriatrics & gerontology international, 9 3, 282-289. Goldman, N., Turra, C. M., Glei, D

  12. Evaluating Students' Perceptions and Attitudes toward Computer-Mediated Project-Based Learning Environment: A Case Study

    Science.gov (United States)

    Seet, Ling Ying Britta; Quek, Choon Lang

    2010-01-01

    This research investigated 68 secondary school students' perceptions of their computer-mediated project-based learning environment and their attitudes towards Project Work (PW) using two instruments--Project Work Classroom Learning Environment Questionnaire (PWCLEQ) and Project Work Related Attitudes Instrument (PWRAI). In this project-based…

  13. Dr.LiTHO: a development and research lithography simulator

    Science.gov (United States)

    Fühner, Tim; Schnattinger, Thomas; Ardelean, Gheorghe; Erdmann, Andreas

    2007-03-01

    This paper introduces Dr.LiTHO, a research and development oriented lithography simulation environment developed at Fraunhofer IISB to flexibly integrate our simulation models into one coherent platform. We propose a light-weight approach to a lithography simulation environment: The use of a scripting (batch) language as an integration platform. Out of the great variety of different scripting languages, Python proved superior in many ways: It exhibits a good-natured learning-curve, it is efficient, available on virtually any platform, and provides sophisticated integration mechanisms for existing programs. In this paper, we will describe the steps, required to provide Python bindings for existing programs and to finally generate an integrated simulation environment. In addition, we will give a short introduction into selected software design demands associated with the development of such a framework. We will especially focus on testing and (both technical and user-oriented) documentation issues. Dr.LiTHO Python files contain not only all simulation parameter settings but also the simulation flow, providing maximum flexibility. In addition to relatively simple batch jobs, repetitive tasks can be pooled in libraries. And as Python is a full-blown programming language, users can add virtually any functionality, which is especially useful in the scope of simulation studies or optimization tasks, that often require masses of evaluations. Furthermore, we will give a short overview of the numerous existing Python packages. Several examples demonstrate the feasibility and productiveness of integrating Python packages into custom Dr.LiTHO scripts.

  14. Enabling remote access to projects in a large collaborative environment

    International Nuclear Information System (INIS)

    Pais, V.F.; Balme, S.; Akpangny, H.S.; Iannone, F.; Strand, P.

    2010-01-01

    In the context of the Integrated Tokamak Modelling Task Force, a large number of software projects are made available to the task force members, including developers and end-users. This has been achieved through a combination of tools and technologies. The front-end is represented by a Java based portal system exposing a PHP project management system, GForge. These two applications are linked by a single sign-on mechanism, Shibboleth , and through secure HTTP request rewriting, where appropriate. Furthermore, the underlying storage facility is an OpenAFS distributed file system and the user base comes from both a network information server and an LDAP directory. Security mechanisms are those of a distributed system, with multiple access points and protocols used for reading and writing data. The present paper presents the challenges of integrating these different technologies and programming languages into a single, working, application presented to its users as a web portal. Chaining of the tools is explored through the user perspective, with an in-depth overview of the background transitions between the various systems involved with regard to security requirements for the front-end nodes and the policies as seen by the users.

  15. Enabling remote access to projects in a large collaborative environment

    Energy Technology Data Exchange (ETDEWEB)

    Pais, V. [INFLPR National Institute for Laser, Plasma and Radiation Physics, Magurele (Romania); Balme, S. [CEA Cadarache, IRFM, 13 - Saint-Paul-lez-Durance (France); Iannonec, F. [Associazione EURATOM-ENEA sulla Fusione, Frascati (Italy); Strand, P. [Department of Radio and Space Science, Chalmers University of Technology, Goteborg (Sweden)

    2009-07-01

    In the context of the Integrated Tokamak Modeling Task Force, a large number of software projects are made available to the task force members, including developers and end-users. This has been achieved through a combination of tools and technologies. The front-end is represented by a Java based portal system exposing a PHP project management system, Gforge. These two applications are linked by a single sign-on mechanism, Shibboleth, and through secure HTTP request rewriting, where appropriate. Furthermore, the underlying storage facility is an OpenAFS distributed file system and the user base comes from both a network information server and an LDAP directory. Security mechanisms are those of a distributed system, with multiple access points and protocols used for reading and writing data. This document presents the challenges of integrating these different technologies and programming languages into a single, working, application presented to its users as a web portal. The chaining of the tools is explored through the user perspective, with an in-depth overview of the background transitions between the various systems involved with regard to security requirements for the front-end nodes and the policies as seen by the users. This document is composed of a poster and its abstract. (authors)

  16. Enabling remote access to projects in a large collaborative environment

    Energy Technology Data Exchange (ETDEWEB)

    Pais, V.F., E-mail: pvf2005@gmail.co [Laser Department, National Institute for Laser, Plasma and Radiation Physics, P.O. Box MG-36, Bucharest 077125, Association EURATOM/MEdC (Romania); Balme, S.; Akpangny, H.S. [Association EURATOM CEA/IRFM CEA-Cadarache (France); Iannone, F. [Associazione EURATOM-ENEA sulla Fusione, C.R.ENEA Frascati, via E.Fermi 45, 00044 Frascati, Rome (Italy); Strand, P. [Department of Radio and Space Science, Chalmers University of Technology, SE-412 96 Goteborg (Sweden)

    2010-07-15

    In the context of the Integrated Tokamak Modelling Task Force, a large number of software projects are made available to the task force members, including developers and end-users. This has been achieved through a combination of tools and technologies. The front-end is represented by a Java based portal system exposing a PHP project management system, GForge. These two applications are linked by a single sign-on mechanism, Shibboleth , and through secure HTTP request rewriting, where appropriate. Furthermore, the underlying storage facility is an OpenAFS distributed file system and the user base comes from both a network information server and an LDAP directory. Security mechanisms are those of a distributed system, with multiple access points and protocols used for reading and writing data. The present paper presents the challenges of integrating these different technologies and programming languages into a single, working, application presented to its users as a web portal. Chaining of the tools is explored through the user perspective, with an in-depth overview of the background transitions between the various systems involved with regard to security requirements for the front-end nodes and the policies as seen by the users.

  17. Rapid fabrication of microfluidic chips based on the simplest LED lithography

    Science.gov (United States)

    Li, Yue; Wu, Ping; Luo, Zhaofeng; Ren, Yuxuan; Liao, Meixiang; Feng, Lili; Li, Yuting; He, Liqun

    2015-05-01

    Microfluidic chips are generally fabricated by a soft lithography method employing commercial lithography equipment. These heavy machines require a critical room environment and high lamp power, and the cost remains too high for most normal laboratories. Here we present a novel microfluidics fabrication method utilizing a portable ultraviolet (UV) LED as an alternative UV source for photolithography. With this approach, we can repeat several common microchannels as do these conventional commercial exposure machines, and both the verticality of the channel sidewall and lithography resolution are proved to be acceptable. Further microfluidics applications such as mixing, blood typing and microdroplet generation are implemented to validate the practicability of the chips. This simple but innovative method decreases the cost and requirement of chip fabrication dramatically and may be more popular with ordinary laboratories.

  18. Rapid fabrication of microfluidic chips based on the simplest LED lithography

    International Nuclear Information System (INIS)

    Li, Yue; Wu, Ping; Liao, Meixiang; Feng, Lili; Li, Yuting; He, Liqun; Luo, Zhaofeng; Ren, Yuxuan

    2015-01-01

    Microfluidic chips are generally fabricated by a soft lithography method employing commercial lithography equipment. These heavy machines require a critical room environment and high lamp power, and the cost remains too high for most normal laboratories. Here we present a novel microfluidics fabrication method utilizing a portable ultraviolet (UV) LED as an alternative UV source for photolithography. With this approach, we can repeat several common microchannels as do these conventional commercial exposure machines, and both the verticality of the channel sidewall and lithography resolution are proved to be acceptable. Further microfluidics applications such as mixing, blood typing and microdroplet generation are implemented to validate the practicability of the chips. This simple but innovative method decreases the cost and requirement of chip fabrication dramatically and may be more popular with ordinary laboratories. (paper)

  19. Sustainable development criteria for Built Environment projects in South Africa (CSIR)

    CSIR Research Space (South Africa)

    Gibberd, Jeremy T

    2010-01-01

    Full Text Available This paper is based on work undertaken for the Gauteng Department of Agriculture and Rural Development (GDARD) developing a set of sustainable development criteria for built environment projects requiring environmental impact assessments. (Gibberd...

  20. Classroom Environment in the Implementation of an Innovative Curriculum Project in Science Education.

    Science.gov (United States)

    Suarez, Mercedes; Pias, Rosa; Membiela, Pedro; Dapia, Dolores

    1998-01-01

    Analyzes the perceptions of students, teachers, and external observers in order to study the influence of classroom environment on the implementation of an innovative project in science education. Contains 33 references. (DDR)

  1. Toward Project-based Learning and Team Formation in Open Learning Environments

    NARCIS (Netherlands)

    Spoelstra, Howard; Van Rosmalen, Peter; Sloep, Peter

    2014-01-01

    Open Learning Environments, MOOCs, as well as Social Learning Networks, embody a new approach to learning. Although both emphasise interactive participation, somewhat surprisingly, they do not readily support bond creating and motivating collaborative learning opportunities. Providing project-based

  2. The radiological impact of the LEP project on the environment

    International Nuclear Information System (INIS)

    Goebel, K.

    1981-01-01

    The siting of the large electron-positron (LEP) accelerator, its experimental areas, and its supporting infrastructure are discussed with respect to the radiological impact on the surrounding areas and on the population in the Pays de Gex and the Canton de Geneve. The final conclusions are based on work done by the former LEP Study Group and by the LEP Radiation Working Group. The calculations and estimates show that the stray ionizing radiation, the radioactivity, and the radiation-induced noxious chemical products released by the LEP installation will have only an insignificant impact on the area, the individual members of the public, and the population as a whole. This result for LEP 'phase 85' can also be extrapolated under reasonable assumptions for LEP 125 - a possible future development phase of the present project. (orig.)

  3. Development of a virtual research environment in ITBL project

    Energy Technology Data Exchange (ETDEWEB)

    Kenji, Higuchi; Takayuki, Otani; Yukihiro, Hasegawa; Yoshio, Suzuki; Nobuhiro, Yamagishi; Kazuyuki, Kimura; Tetsuo, Aoyagi; Norihiro, Nakajima; Masahiro, Fukuda [Japan Atomic Energy Research Institute (Japan); Toshiyuki, Imamura [University of Electro-Communications (Japan); Genki, Yagawa [Tokyo University (Japan)

    2003-07-01

    With the progress of computers and high-speed networks, it becomes possible to perform research work efficiently by combining computing, data and experimental resources which are widely distributed over multi-sites, or by sharing information among collaborators who belong to different organizations. An experimental application of Grid computing was executed in ITBL (information technology based laboratory) project promoted by six member institutes of MEXT (ministry of education, culture, sports, sciences and technology). Key technologies that are indispensable for construction of virtual organization were implemented onto ITBL Middle-ware and examined in the experiment from a view point of availability. It seems that successful result in the implementation and examination of those technologies such as security infrastructure, component programming and collaborative visualization in practical computer/network systems means significant progress in Science Grid in Japan.

  4. Development of a virtual research environment in ITBL project

    International Nuclear Information System (INIS)

    Kenji, Higuchi; Takayuki, Otani; Yukihiro, Hasegawa; Yoshio, Suzuki; Nobuhiro, Yamagishi; Kazuyuki, Kimura; Tetsuo, Aoyagi; Norihiro, Nakajima; Masahiro, Fukuda; Toshiyuki, Imamura; Genki, Yagawa

    2003-01-01

    With the progress of computers and high-speed networks, it becomes possible to perform research work efficiently by combining computing, data and experimental resources which are widely distributed over multi-sites, or by sharing information among collaborators who belong to different organizations. An experimental application of Grid computing was executed in ITBL (information technology based laboratory) project promoted by six member institutes of MEXT (ministry of education, culture, sports, sciences and technology). Key technologies that are indispensable for construction of virtual organization were implemented onto ITBL Middle-ware and examined in the experiment from a view point of availability. It seems that successful result in the implementation and examination of those technologies such as security infrastructure, component programming and collaborative visualization in practical computer/network systems means significant progress in Science Grid in Japan

  5. Re-designing project management : Steps towards a project management curriculum for a sustainable built environment

    NARCIS (Netherlands)

    Heintz, J.L.; Lousberg, L.H.M.J.; Prins, M.

    2015-01-01

    Sustainability concerns add a wide range of both stakeholders and performance expectations to building projects. The transition of a circular economy will also have a significant impact on the way in which building projects are carried out. This in addition to an already established escalation of

  6. Fitting the project into the environment : Gulf Heavy Oil Red Cross Projects

    International Nuclear Information System (INIS)

    Sakires, D.G.; Johannesen, D.V.

    1998-01-01

    A reservoir delineation project by Gulf Canada's Heavy Oil Division was reviewed. The six well drilling program was completed in 1997 with minimal negative environmental impacts. The program, dubbed the Red Cross project, took place in the Northern Boreal Forest of Saskatchewan. Its success is attributed to the early involvement of the regulatory agencies in Saskatchewan, on-site environmental investigations, the development of an environmental protection plan, conscientious construction practices, a monitoring program during construction, and a pro-active reclamation plan. The project area is identified as being environmentally sensitive and important as a wildlife habitat area. This successful project demonstrated the usefulness of pre-project planning and team work between industry and the regulators. Details of the planning, construction and planned remedial reclamation actions are described. 11 refs., 2 tabs

  7. Data sharing system for lithography APC

    Science.gov (United States)

    Kawamura, Eiichi; Teranishi, Yoshiharu; Shimabara, Masanori

    2007-03-01

    We have developed a simple and cost-effective data sharing system between fabs for lithography advanced process control (APC). Lithography APC requires process flow, inter-layer information, history information, mask information and so on. So, inter-APC data sharing system has become necessary when lots are to be processed in multiple fabs (usually two fabs). The development cost and maintenance cost also have to be taken into account. The system handles minimum information necessary to make trend prediction for the lots. Three types of data have to be shared for precise trend prediction. First one is device information of the lots, e.g., process flow of the device and inter-layer information. Second one is mask information from mask suppliers, e.g., pattern characteristics and pattern widths. Last one is history data of the lots. Device information is electronic file and easy to handle. The electronic file is common between APCs and uploaded into the database. As for mask information sharing, mask information described in common format is obtained via Wide Area Network (WAN) from mask-vender will be stored in the mask-information data server. This information is periodically transferred to one specific lithography-APC server and compiled into the database. This lithography-APC server periodically delivers the mask-information to every other lithography-APC server. Process-history data sharing system mainly consists of function of delivering process-history data. In shipping production lots to another fab, the product-related process-history data is delivered by the lithography-APC server from the shipping site. We have confirmed the function and effectiveness of data sharing systems.

  8. Peer Feedback to Facilitate Project-Based Learning in an Online Environment

    Science.gov (United States)

    Ching, Yu-Hui; Hsu, Yu-Chang

    2013-01-01

    There has been limited research examining the pedagogical benefits of peer feedback for facilitating project-based learning in an online environment. Using a mixed method approach, this paper examines graduate students' participation and perceptions of peer feedback activity that supports project-based learning in an online instructional design…

  9. Motivating Students to Develop Satellites in a Problem and Project-Based Learning Environment

    DEFF Research Database (Denmark)

    Larsen, Jesper Abildgaard; Nielsen, Jens Frederik Dalsgaard; Zhou, Chunfang

    2013-01-01

    During the last decade, a total of three student satellites have been developed by engineering students in a Problem and Project-Based Learning (PBL) environment at Aalborg University (AAU), Denmark. As solving such a complex project, we emphasize that a high level of motivation is needed for the...

  10. Feasibility of groundwater recharge dam projects in arid environments

    Science.gov (United States)

    Jaafar, H. H.

    2014-05-01

    A new method for determining feasibility and prioritizing investments for agricultural and domestic recharge dams in arid regions is developed and presented. The method is based on identifying the factors affecting the decision making process and evaluating these factors, followed by determining the indices in a GIS-aided environment. Evaluated parameters include results from field surveys and site visits, land cover and soils data, precipitation data, runoff data and modeling, number of beneficiaries, domestic irrigation demand, reservoir objectives, demography, reservoirs yield and reliability, dam structures, construction costs, and operation and maintenance costs. Results of a case study on more than eighty proposed dams indicate that assessment of reliability, annualized cost/demand satisfied and yield is crucial prior to investment decision making in arid areas. Irrigation demand is the major influencing parameter on yield and reliability of recharge dams, even when only 3 months of the demand were included. Reliability of the proposed reservoirs as related to their standardized size and net inflow was found to increase with increasing yield. High priority dams were less than 4% of the total, and less priority dams amounted to 23%, with the remaining found to be not feasible. The results of this methodology and its application has proved effective in guiding stakeholders for defining most favorable sites for preliminary and detailed design studies and commissioning.

  11. Web Environments for Group-Based Project Work in Higher Education

    NARCIS (Netherlands)

    Andernach, J.A.; van Diepen, N.M.; Collis, Betty; Andernach, Toine

    1997-01-01

    We discuss problems confronting the use of group-based project work as an instructional strategy in higher education and describe two courses in which course-specific World Wide Web (Web) environments have evolved over a series of course sequences and are used both as tool environments for

  12. R&D Project Valuation Considering Changes of Economic Environment: A Case of a Pharmaceutical R&D Project

    Directory of Open Access Journals (Sweden)

    Jung Ho Park

    2018-03-01

    Full Text Available R&D project valuation is important for effective R&D portfolio management through decision making, related to the firm’s R&D productivity, sustainable management. In particular, scholars have emphasized the necessities of capturing option value in R&D and developed methods of real option valuation. However, despite suggesting various real option models, there are few studies on simultaneously employing mean-reverting stochastic process and Markov regime switching to describe the evolution of cash flow and to reflect time-varying parameters resulting from changes of economic environment. Therefore, we suggest a mean-reverting binomial lattice model under Markov regime switching and apply it to evaluate clinical development with project cases of the pharmaceutical industry. This study finds that decision making can be different according to the regime condition, thus the suggested model can capture risks caused by the uncertainty of the economic environment, represented by regime switching. Further, this study simulates the model according to rate parameter from 0.00 to 1.00 and risk-free interest rates for regimes 1 and 2 from ( r 1 = 4%, r 2 = 2% to ( r 1 = 7%, r 2 = 5%, and confirms the rigidity of the model. Therefore, in practice, the mean-reverting binomial lattice model under Markov regime switching proposed in this study for R&D project valuation contributes to assisting company R&D project managers make effective decision making considering current economic environment and future changes.

  13. Solvent-vapor-assisted imprint lithography

    NARCIS (Netherlands)

    Voicu, Nicoleta E.; Ludwigs, Sabine; Crossland, Edward J. W.; Andrew, Piers; Steiner, Ullrich

    2007-01-01

    Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity

  14. EUV lithography : historical perspective and road ahead

    NARCIS (Netherlands)

    Banine, V.Y.

    2014-01-01

    Lithography, in the form of carved type printing, can be dated as far back as the 3rd century AD. Starting from the 19th century it played a major role as the basis for dissemination and preservation of knowledge in the form of printed books, maps, newspapers, etc. In the mid 20th century, with the

  15. Helium ion lithography principles and performance

    NARCIS (Netherlands)

    Drift, E. van der; Maas, D.J.

    2012-01-01

    Recent developments show that Scanning Helium Ion Beam Lithography (SHIBL) with a sub-nanometer beam diameter is a promising alternative fabrication technique for high-resolution nanostructures at high pattern densities. Key principles and critical conditions of the technique are explained. From

  16. Human factors and technology environment in multinational project: problems and solutions

    International Nuclear Information System (INIS)

    Jardi Besa, X.; Munoz Cervantes, A.

    2012-01-01

    At the onset of nuclear projects in Spain, there was an import of nuclear technology. In a second phase, there was a transfer of technology. Subsequently, there was an adaptation of the technology. In this evolution, comparable to that of other countries, were involved several countries, overcoming the difficulties of human factors involved. The current nuclear projects multinationals have a new difficulty: the different industrial technological environments. This paper will address the organizational challenges of multinational engineering projects, in the type of project and the human factors of the participating companies.

  17. Pattern Definition with DUV-Lithography at DTU Danchip

    DEFF Research Database (Denmark)

    Keil, Matthias; Khomtchenko, Elena; Nyholt, Henrik

    2014-01-01

    Deep ultra violet (DUV) illumination generated with the help of a KrF laser can be utilized to produce components having sizes of some hundreds of nanometers. This light source with its 248nm wavelength is exploited in the DUV-lithography equipment at DTU Danchip in order to fill the resolution gap...... - as shown in fig. 2 - utilizing the possibility of beam shape variations that enables to adapt the resolution and the depth of focus of the stepper to the requirements of the fabricated device. However, generally the highest achievable resolution is dependent on the pattern type - as e.g. pillar, line...... or hole comprising patterns -, its symmetry and the separations between the different structures. The projection lithography tool FPA-3000EX4 from Canon (max. NA=0,6; 1:5 reduction) produces patterns on the wafer within a maximum chip area of 22x22mm2 that can be stitched together with an accuracy of 3σ...

  18. Interpreting cost of ownership for mix-and-match lithography

    Science.gov (United States)

    Levine, Alan L.; Bergendahl, Albert S.

    1994-05-01

    Cost of ownership modeling is a critical and emerging tool that provides significant insight into the ways to optimize device manufacturing costs. The development of a model to deal with a particular application, mix-and-match lithography, was performed in order to determine the level of cost savings and the optimum ways to create these savings. The use of sensitivity analysis with cost of ownership allows the user to make accurate trade-offs between technology and cost. The use and interpretation of the model results are described in this paper. Parameters analyzed include several manufacturing considerations -- depreciation, maintenance, engineering and operator labor, floorspace, resist, consumables and reticles. Inherent in this study is the ability to customize this analysis for a particular operating environment. Results demonstrate the clear advantages of a mix-and-match approach for three different operating environments. These case studies also demonstrate various methods to efficiently optimize cost savings strategies.

  19. Managing large energy and mineral resources (EMR) projects in challenging environments

    Science.gov (United States)

    Chanmeka, Arpamart

    The viability of energy mineral resources (EMR) construction projects is contingent upon the state of the world economic climate. Oil sands projects in Alberta, Canada exemplify large EMR projects that are highly sensitive to fluctuations in the world market. Alberta EMR projects are constrained by high fixed production costs and are also widely recognized as one of the most challenging construction projects to successfully deliver due to impacts from extreme weather conditions, remote locations and issues with labor availability amongst others. As indicated in many studies, these hardships strain the industry's ability to execute work efficiently, resulting in declining productivity and mounting cost and schedule overruns. Therefore, to enhance the competitiveness of Alberta EMR projects, project teams are targeting effective management strategies to enhance project performance and productivity by countering the uniquely challenging environment in Alberta. The main purpose of this research is to develop industry wide benchmarking tailored to the specific constraints and challenges of Alberta. Results support quantitative assessments and identify the root causes of project performance and ineffective field productivity problems in the heavy industry sector capital projects. Customized metrics produced from the data collected through a web-based survey instrument were used to quantitatively assess project performance in the following dimensions: cost, schedule, change, rework, safety, engineering and construction productivity and construction practices. The system enables the industry to measure project performance more accurately, get meaningful comparisons, while establishing credible norms specific to Alberta projects. Data analysis to identify the root cause of performance problems was conducted. The analysis of Alberta projects substantiated lessons of previous studies to create an improved awareness of the abilities of Alberta-based companies to manage their

  20. A Social Contract for University-Industry Collaboration: A Case of Project-Based Learning Environment

    Science.gov (United States)

    Vartiainen, Tero

    This study determines a social contract for a form of university-industry collaboration to a project-based learning environment in close collaboration with industry. The author's previous studies on moral conflicts in a project-based learning (PjBL) environment and his 5-year engagement in the PjBL environment are used as background knowledge, and John Rawls' veil of ignorance is used as a method in the contract formulation. Fair and impartial treatment of actors is strived for with the contract which constitutes of sets of obligations for each party, students, clients, and university (instructors) in the chosen project course. With the contract fair and impartial treatment of actors is strived for and the most dilemmatic moral conflicts are tried to be avoided. The forming of the social contract is evaluated, and implications for research and collaborations in practice are offered.

  1. Hierarchical biodiversity and environment impact assessment of South-to-North Water Diversion Project of China

    OpenAIRE

    Youhua Chen

    2013-01-01

    In this brief review, the potential environmental and biodiversity impact of South-to-North Water Diversion (SNWD) project in China on regional environments was assessed. I used the hierarchical environmental impact assessment to classify the possible impacts into three orders caused by the construction of SNWD and then presented the current research advances on each order of the impacts. Further impact assessments should be reinforced during the construction period of SNDW project for the su...

  2. Establishing an EnvironMentors Project to Guide Minority Students into Science, Technology, and Environmental Careers

    Energy Technology Data Exchange (ETDEWEB)

    Montague, W. E.

    2003-01-24

    This report of the EnvironMentors Project (TEP) for the period February 1994 through December 1998, provides a summary of activities at our program sites and of our overall organizational accomplishments. Notably, the EnvironMentors Project matched 506 teens from under-resourced neighborhoods in Washington (DC), Trenton (NJ), and Baltimore (MD) with mentors, engaged more than 1,600 members of the public in informative discussions of environmental research, and presented interactive environmental education lessons to approximately 5,700 elementary and middle school children.

  3. River Protection Project: Interface Management in the Multi Contract Project Environment at Hanford

    International Nuclear Information System (INIS)

    SHIKASHIO, L.A.

    2000-01-01

    The Office of River Protection (ORP) is implementing the River Protection Project (RPP) using two prime contractors. CH2M Hill Hanford Group, Inc. (CHG) is responsible for operating the existing tank system, delivering the waste feed to the waste treatment plant, and managing the resulting low- and high-level glass waste ''product'' through a performance-based fee type contract. A separate prime contractor will be responsible for designing, constructing and commissioning of a new Waste Treatment and Immobilization Plant (WTP), and preparing the waste for ultimate disposal. In addition to the prime contractors and their interfaces, the River Protection Project is being conducted on the Hanford Site, which is under the management of another DOE organization, DOE Richland Field Office (DOE-RL). The infrastructure and utilities are provided by DOE-RL, for example. In addition, there are multiple other technical interfaces with federal, state and other regulatory agencies that influence the management of the activities. This paper provides an overview of the approach employed by ORP to identify, coordinate, and manage the technical interfaces of RPP. In addition, this paper describes the approach and methodologies used to: Establish an overall framework for interface management. Establish the requirements for defining and managing interfaces for the prime contractors and DOE. Contractually requiring the prime contractors to control and manage the interfaces

  4. Organising Sustainable Transition: Understanding the Product, Project and Service Domain of the Built Environment

    DEFF Research Database (Denmark)

    Thuesen, Christian; Koch-Ørvad, Nina; Maslesa, Esmir

    2016-01-01

    of three generic domains - the Project, Product and Service domain - with widely different markets, companies, business models and regulation. Besides identifying the characteristics of the different domains, the findings show that these domains are interdependent, but largely live their own lives......Sustainable transition of the built environment con struction industry is challenging the existing construction practices and business models. This article presents a framework for understanding and facilitating sustainable transition in the built environment. The framework was developed through...

  5. Fabrication of a Polymer Micro Needle Array by Mask-Dragging X-Ray Lithography and Alignment X-Ray Lithography

    Science.gov (United States)

    Li, Yi-Gui; Yang, Chun-Sheng; Liu, Jing-Quan; Sugiyama, Susumu

    2011-03-01

    Polymer materials such as transparent thermoplastic poly(methyl methacrylate) (PMMA) have been of great interest in the research and development of integrated circuits and micro-electromechanical systems due to their relatively low cost and easy process. We fabricated PMMA-based polymer hollow microneedle arrays by mask-dragging and aligning x-ray lithography. Techniques for 3D micromachining by direct lithography using x-rays are developed. These techniques are based on using image projection in which the x-ray is used to illuminate an appropriate gold pattern on a polyimide film mask. The mask is imaged onto the PMMA sample. A pattern with an area of up to 100 × 100mm2 can be fabricated with sub-micron resolution and a highly accurate order of a few microns by using a dragging mask. The fabrication technology has several advantages, such as forming complex 3D micro structures, high throughput and low cost.

  6. Gender and Diversity in a Problem and Project Based Learning Environment

    DEFF Research Database (Denmark)

    Du, Xiangyun

    Problem and Project Based Learning (PBL) has been well used as an educational philosophy and methodology in the construction of student centered and contextualized learning environment. PBL is also regarded as an effective method in producing engineering graduates who can not only meet the needs...... on the learning experiences of engineering students in the PBL environment in Denmark. This book also attempts to question the issue of diversity in engineering education via the exploration of whether or in which ways the PBL environment is friendly to diverse groups of learners such as women....

  7. Mask-induced aberration in EUV lithography

    Science.gov (United States)

    Nakajima, Yumi; Sato, Takashi; Inanami, Ryoichi; Nakasugi, Tetsuro; Higashiki, Tatsuhiko

    2009-04-01

    We estimated aberrations using Zernike sensitivity analysis. We found the difference of the tolerated aberration with line direction for illumination. The tolerated aberration of perpendicular line for illumination is much smaller than that of parallel line. We consider this difference to be attributable to the mask 3D effect. We call it mask-induced aberration. In the case of the perpendicular line for illumination, there was a difference in CD between right line and left line without aberration. In this report, we discuss the possibility of pattern formation in NA 0.25 generation EUV lithography tool. In perpendicular pattern for EUV light, the dominant part of aberration is mask-induced aberration. In EUV lithography, pattern correction based on the mask topography effect will be more important.

  8. Electron Beam Lithography for nano-patterning

    DEFF Research Database (Denmark)

    Greibe, Tine; Anhøj, Thomas Aarøe; Khomtchenko, Elena

    2014-01-01

    in a polymer. Electron beam lithography is a suitable method for nano-sized production, research, or development of semiconductor components on a low-volume level. Here, we present electron beam lithography available at DTU Danchip. We expertize a JEOL 9500FZ with electrons accelerated to an energy of 100ke......, the room temperature is controlled to an accuracy of 0.1 degrees in order to minimize the thermally induced drift of the beam during pattern writing. We present process results in a standard positive tone resist and pattern transfer through etch to a Silicon substrate. Even though the electron beam...... of electrons in the substrate will influence the patterning. We present solutions to overcome these obstacles....

  9. Scanning probe lithography for nanoimprinting mould fabrication

    International Nuclear Information System (INIS)

    Luo Gang; Xie Guoyong; Zhang Yongyi; Zhang Guoming; Zhang Yingying; Carlberg, Patrick; Zhu Tao; Liu Zhongfan

    2006-01-01

    We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si(110) and Si(100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 μm by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds

  10. Using a Virtual Learning Environment to Manage Group Projects: A Case Study

    Science.gov (United States)

    Cleary, Yvonne; Marcus-Quinn, Ann

    2008-01-01

    Virtual Learning Environments (VLEs) are increasingly used by Higher Education Institutions to manage and enhance teaching and learning, and research. Discussion, chat, scheduling, and other collaboration tools make VLEs especially useful systems for designing and managing complex group projects. In the spring semester of 2006, students at the…

  11. Project CHERISH (Children in Home Environments: Regulation To Improve Safety and Health). Final Report.

    Science.gov (United States)

    Grubb, Paul Dallas

    In 1990, Project CHERISH (Children in Home Environments: Regulation to Increase Safety and Health) enabled the Texas Department of Human Services to implement and evaluate several innovative strategies to strengthen regulation of family day care homes. This report contains descriptions of those strategies, an evaluation of their efficacy, and…

  12. An Adaptive Approach to Managing Knowledge Development in a Project-Based Learning Environment

    Science.gov (United States)

    Tilchin, Oleg; Kittany, Mohamed

    2016-01-01

    In this paper we propose an adaptive approach to managing the development of students' knowledge in the comprehensive project-based learning (PBL) environment. Subject study is realized by two-stage PBL. It shapes adaptive knowledge management (KM) process and promotes the correct balance between personalized and collaborative learning. The…

  13. Students' Perceptions of a Project-Based Organic Chemistry Laboratory Environment: A Phenomenographic Approach

    Science.gov (United States)

    Burrows, Nikita L.; Nowak, Montana K.; Mooring, Suazette R.

    2017-01-01

    Students can perceive the laboratory environment in a variety of ways that can affect what they take away from the laboratory course. This qualitative study characterizes undergraduate students' perspectives of a project-based Organic Chemistry laboratory using the theoretical framework of phenomenography. Eighteen participants were interviewed in…

  14. Hard-tip, soft-spring lithography.

    Science.gov (United States)

    Shim, Wooyoung; Braunschweig, Adam B; Liao, Xing; Chai, Jinan; Lim, Jong Kuk; Zheng, Gengfeng; Mirkin, Chad A

    2011-01-27

    Nanofabrication strategies are becoming increasingly expensive and equipment-intensive, and consequently less accessible to researchers. As an alternative, scanning probe lithography has become a popular means of preparing nanoscale structures, in part owing to its relatively low cost and high resolution, and a registration accuracy that exceeds most existing technologies. However, increasing the throughput of cantilever-based scanning probe systems while maintaining their resolution and registration advantages has from the outset been a significant challenge. Even with impressive recent advances in cantilever array design, such arrays tend to be highly specialized for a given application, expensive, and often difficult to implement. It is therefore difficult to imagine commercially viable production methods based on scanning probe systems that rely on conventional cantilevers. Here we describe a low-cost and scalable cantilever-free tip-based nanopatterning method that uses an array of hard silicon tips mounted onto an elastomeric backing. This method-which we term hard-tip, soft-spring lithography-overcomes the throughput problems of cantilever-based scanning probe systems and the resolution limits imposed by the use of elastomeric stamps and tips: it is capable of delivering materials or energy to a surface to create arbitrary patterns of features with sub-50-nm resolution over centimetre-scale areas. We argue that hard-tip, soft-spring lithography is a versatile nanolithography strategy that should be widely adopted by academic and industrial researchers for rapid prototyping applications.

  15. Compact synchrotron radiation depth lithography facility

    Science.gov (United States)

    Knüppel, O.; Kadereit, D.; Neff, B.; Hormes, J.

    1992-01-01

    X-ray depth lithography allows the fabrication of plastic microstructures with heights of up to 1 mm but with the smallest possible lateral dimensions of about 1 μm. A resist is irradiated with ``white'' synchrotron radiation through a mask that is partially covered with x-ray absorbing microstructures. The plastic microstructure is then obtained by a subsequent chemical development of the irradiated resist. In order to irradiate a reasonably large resist area, the mask and the resist have to be ``scanned'' across the vertically thin beam of the synchrotron radiation. A flexible, nonexpensive and compact scanner apparatus has been built for x-ray depth lithography at the beamline BN1 at ELSA (the 3.5 GeV Electron Stretcher and Accelerator at the Physikalisches Institut of Bonn University). Measurements with an electronic water level showed that the apparatus limits the scanner-induced structure precision to not more than 0.02 μm. The whole apparatus is installed in a vacuum chamber thus allowing lithography under different process gases and pressures.

  16. Results from the European Integrated Project '' New Materials for Extreme Environments (ExtreMat) ''

    International Nuclear Information System (INIS)

    Bolt, H.; Linsmeier, Ch.; Baluc, N.; Garcia-Rosales, G.; Gualco, G. C.; Simancik, F.

    2006-01-01

    The goal of the European Integrated Project '' ExtreMat '' is to provide and to industrialize new materials and their compounds for applications in extreme environments that are beyond reach with incremental materials development only. The R(and)D activities in this project aim to provide a) self-passivating protection materials for sensitive structures operated in physico-chemically aggressive environments at high temperatures; b) new heat sink materials with the capability of very efficient heat removal, often at very high temperature level; c) radiation resistant materials for very high operation temperatures; d) new processing routes for complex heterogeneous compounds that can be operated in extreme environments. Key applications for these new materials are in the sectors of fusion, advanced fission, space, and electronic applications. Further use of these materials is expected in spin-off fields, such as brake applications and energy conversion. The project started in December 2004 for a duration of five years and is supported by the European Community. The 37 project participants are from 13 EU member states and include 6 universities, 7 research institutes, 10 research centres and 14 industrial companies. Research results regarding the development of materials for application in nuclear fusion, especially on protection, heat sink, and radiation resistant materials will be presented. A view to other applications of these materials in the fields of fission, space and electronics will be given in the presentation. ExtreMat Project Partners: see http://www.extremat.org/. (author)

  17. PREVAIL: IBM's e-beam technology for next generation lithography

    Science.gov (United States)

    Pfeiffer, Hans C.

    2000-07-01

    PREVAIL - Projection Reduction Exposure with Variable Axis Immersion Lenses represents the high throughput e-beam projection approach to NGL which IBM is pursuing in cooperation with Nikon Corporation as alliance partner. This paper discusses the challenges and accomplishments of the PREVAIL project. The supreme challenge facing all e-beam lithography approaches has been and still is throughput. Since the throughput of e-beam projection systems is severely limited by the available optical field size, the key to success is the ability to overcome this limitation. The PREVAIL technique overcomes field-limiting off-axis aberrations through the use of variable axis lenses, which electronically shift the optical axis simultaneously with the deflected beam so that the beam effectively remains on axis. The resist images obtained with the Proof-of-Concept (POC) system demonstrate that PREVAIL effectively eliminates off- axis aberrations affecting both resolution and placement accuracy of pixels. As part of the POC system a high emittance gun has been developed to provide uniform illumination of the patterned subfield and to fill the large numerical aperture projection optics designed to significantly reduce beam blur caused by Coulomb interaction.

  18. Regular cell design approach considering lithography-induced process variations

    OpenAIRE

    Gómez Fernández, Sergio

    2014-01-01

    The deployment delays for EUVL, forces IC design to continue using 193nm wavelength lithography with innovative and costly techniques in order to faithfully print sub-wavelength features and combat lithography induced process variations. The effect of the lithography gap in current and upcoming technologies is to cause severe distortions due to optical diffraction in the printed patterns and thus degrading manufacturing yield. Therefore, a paradigm shift in layout design is mandatory towards ...

  19. Plasmonic direct writing lithography with a macroscopical contact probe

    Science.gov (United States)

    Huang, Yuerong; Liu, Ling; Wang, Changtao; Chen, Weidong; Liu, Yunyue; Li, Ling

    2018-05-01

    In this work, we design a plasmonic direct writing lithography system with a macroscopical contact probe to achieve nanometer scale spots. The probe with bowtie-shaped aperture array adopts spring hinge and beam deflection method (BDM) to realize near-field lithography. Lithography results show that a macroscopical plasmonic contact probe can achieve a patterning resolution of around 75 nm at 365 nm wavelength, and demonstrate that the lithography system is promising for practical applications due to beyond the diffraction limit, low cost, and simplification of system configuration. CST calculations provide a guide for the design of recording structure and the arrangement of placing polarizer.

  20. Dynamic Properties of Individual Carbon Nanotube Emitters for Maskless Lithography

    National Research Council Canada - National Science Library

    Ribaya, Bryan P; Niemann, Darrell L; Makarewicz, Joseph; Gunther, Norman G; Nguyen, Cattien V; Rahman, Mahmud

    2008-01-01

    .... The individual CNT's low electron beam energy spread and high brightness values make it particularly desirable for advanced applications such as electron microscopy and electron beam lithography...

  1. High-resolution imprint and soft lithography for patterning self-assembling systems

    NARCIS (Netherlands)

    Duan, X.

    2010-01-01

    This thesis contributes to the continuous development of patterning strategies in several different areas of unconventional nanofabrication. A series of soft lithography approaches (microcontact printing, nanomolding in capillaries), nanoimprint lithography (NIL), and capillary force lithography

  2. Multiple beam interference lithography: A tool for rapid fabrication of plasmonic arrays of arbitrary shaped nanomotifs

    Czech Academy of Sciences Publication Activity Database

    Vala, Milan; Homola, Jiří

    2016-01-01

    Roč. 24, č. 14 (2016), s. 15656-15665 ISSN 1094-4087 R&D Projects: GA ČR(CZ) GBP205/12/G118 Grant - others:AV ČR(CZ) AP1101 Program:Akademická prémie - Praemium Academiae Institutional support: RVO:67985882 Keywords : displacement talbot lithography * noncoplanar beams * large areas Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 3.307, year: 2016

  3. Collaborative learning environments and collective creation in 3 weeks bside project experience

    Directory of Open Access Journals (Sweden)

    Carlos Javier Rodríguez Sánchez

    2016-07-01

    Full Text Available This  paper proposes  a  socio-critical review  and  reflection  related to collaborative learning environment as pedagogical agent and its relationship with artistic-practice communities of collective creativity. The main goal of this research is to introduce the case study 3 weeks bside project experience (3WBPE, from now on. Through participatory action research and the analysis of different concepts and their practical and theoretical aspects. In the framework of an education self-manage- ment development universe, the project pro- cess is based on a collaborative learning. It is focused on the constructions of a common discourse about the idea of territory that is represented in a publication and site specific exhibition. 3WBPE allowed setting up stanc- es that suggest a social interaction transfer related to construction of belong, participa- tion and transformation environment, ques- tion a teacher role or collective creation of a project, emphasizing the importance of pro- cess as a goal, beyond of culture artifact pro- ductions. It was dealt with dialog structures, where a social harmony supposed a personal and common reflection space about author’s stance, nigh socio-culture environments and the bond within the education, arts and visu- al culture focused in the horizontal and flexi- ble work capacity, that proposes a collabora- tive learning environment settings.

  4. Medical students' perceptions of their learning environment during a mandatory research project.

    Science.gov (United States)

    Möller, Riitta; Ponzer, Sari; Shoshan, Maria

    2017-10-20

    To explore medical students´ perceptions of their learning environment during a mandatory 20-week scientific research project. This cross-sectional study was conducted between 2011 and 2013. A total of 651 medical students were asked to fill in the Clinical Learning Environment, Supervision, and Nurse Teacher (CLES+T) questionnaire, and 439 (mean age 26 years, range 21-40, 60% females) returned the questionnaire, which corresponds to a response rate of 67%. The Mann-Whitney U test or the Kruskal-Wallis test were used to compare the research environments. The item My workplace can be regarded as a good learning environment correlated strongly with the item There were sufficient meaningful learning situations (r= 0.71, psatisfaction with supervision correlated strongly with the items interaction (r=0.78, p work in close collaboration.

  5. Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

    Czech Academy of Sciences Publication Activity Database

    Vala, Milan; Homola, Jiří

    2014-01-01

    Roč. 22, č. 15 (2014), s. 18778-18789 ISSN 1094-4087 R&D Projects: GA ČR GBP205/12/G118 Institutional support: RVO:67985882 Keywords : Interference lithography * Polymer substrate * Four-beam interference Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 3.488, year: 2014

  6. LP DAAC MEaSUREs Project Artifact Tracking Via the NASA Earthdata Collaboration Environment

    Science.gov (United States)

    Bennett, S. D.

    2015-12-01

    The Land Processes Distributed Active Archive Center (LP DAAC) is a NASA Earth Observing System (EOS) Data and Information System (EOSDIS) DAAC that supports selected EOS Community non-standard data products such as the Advanced Spaceborne Thermal Emission and Reflection Radiometer (ASTER) Global Emissivity Database (GED), and also supports NASA Earth Science programs such as Making Earth System Data Records for Use in Research Environments (MEaSUREs) to contribute in providing long-term, consistent, and mature data products. As described in The LP DAAC Project Lifecycle Plan (Daucsavage, J.; Bennett, S., 2014), key elements within the Project Inception Phase fuse knowledge between NASA stakeholders, data producers, and NASA data providers. To support and deliver excellence for NASA data stewardship, and to accommodate long-tail data preservation with Community and MEaSUREs products, the LP DAAC is utilizing NASA's own Earthdata Collaboration Environment to bridge stakeholder communication divides. By leveraging a NASA supported platform, this poster describes how the Atlassian Confluence software combined with a NASA URS/Earthdata support can maintain each project's members, status, documentation, and artifact checklist. Furthermore, this solution provides a gateway for project communities to become familiar with NASA clients, as well as educating the project's NASA DAAC Scientists for NASA client distribution.

  7. A Study of Using Simulation to Overcome Obstacles That Block the Implementation of Critical Chain Project Management to Project Management Environment

    OpenAIRE

    Chia-Ling Huang; Rong-Kwei Li; Chih-Hung Tsai; Yi-Chan Chung; Yao-Wen Hsu

    2014-01-01

    Since 1997, the Critical Chain Project Management (CCPM) method has received considerable attention. Hundreds of successful CCPM cases have achieved highly reliable on-time delivery (OTD) with short project lead-time (PLT) in multi-project environments. However, two obstacles have remained, blocking the implementation of CCPM to project management (PM) society. The first has been addressed by PM practitioners, who have been less than confident that OTD and PLT can be significantly improved by...

  8. Affective Architecture. Film as a Sensory Transference Tool and an Intimacy Projection Environment

    DEFF Research Database (Denmark)

    Petersen, Rikke Munck; Farsø, Mads

    2016-01-01

    , with our bodies, perceive space and project space. Through an analysis of two films, it points to the medium of film as both a tool and an environment, based on Gernot Böhme’s ‘Raum leiblicher Anwesenheit (Böhme 2006). These films illustrate how the film’s picture frame becomes almost like a skin......This paper elucidates how film may offer itself as a tool for both the representation and conception of space that can strengthen an alternative, phenomenological and transcendental position in architecture. The paper underscores that the film camera can work as a kind of amplifier of how we...... and through its surface and sound projects both a site and a near-sensual experience simultaneously. The medium of film as both tool and an environment thereby supports an extended sensory-intimate reflection on outer experiences and inner sensations that – in its audio-visual and time...

  9. Plasma sources for EUV lithography exposure tools

    International Nuclear Information System (INIS)

    Banine, Vadim; Moors, Roel

    2004-01-01

    The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil extremely high demands both technical and cost oriented. The EUVL tool operates at a wavelength in the range 13-14 nm, which requires a major re-thinking of state-of-the-art lithography systems operating in the DUV range. The light production mechanism changes from conventional lamps and lasers to relatively high temperature emitting plasmas. The light transport, mainly refractive for DUV, should become reflective for EUV. The source specifications are derived from the customer requirements for the complete tool, which are: throughput, cost of ownership (CoO) and imaging quality. The EUVL system is considered as a follow up of the existing DUV based lithography technology and, while improving the feature resolution, it has to maintain high wafer throughput performance, which is driven by the overall CoO picture. This in turn puts quite high requirements on the collectable in-band power produced by an EUV source. Increased, due to improved feature resolution, critical dimension (CD) control requirements, together with reflective optics restrictions, necessitate pulse-to-pulse repeatability, spatial stability control and repetition rates, which are substantially better than those of current optical systems. All together the following aspects of the source specification will be addressed: the operating wavelength, the EUV power, the hot spot size, the collectable angle, the repetition rate, the pulse-to-pulse repeatability and the debris induced lifetime of components

  10. The Costa Rica GLOBE (Global Learning and Observations to Benefit the Environment) Project as a Learning Science Environment

    Science.gov (United States)

    Castro Rojas, María Dolores; Zuñiga, Ana Lourdes Acuña; Ugalde, Emmanuel Fonseca

    2015-12-01

    GLOBE is a global educational program for elementary and high school levels, and its main purpose in Costa Rica is to develop scientific thinking and interest for science in high school students through hydrology research projects that allow them to relate science with environmental issues in their communities. Youth between 12 and 17 years old from public schools participate in science clubs outside of their regular school schedule. A comparison study was performed between different groups, in order to assess GLOBE's applicability as a learning science atmosphere and the motivation and interest it generates in students toward science. Internationally applied scales were used as tools for measuring such indicators, adapted to the Costa Rican context. The results provide evidence statistically significant that the students perceive the GLOBE atmosphere as an enriched environment for science learning in comparison with the traditional science class. Moreover, students feel more confident, motivated and interested in science than their peers who do not participate in the project. However, the results were not statistically significant in this last respect.

  11. Fabrication of biopolymer cantilevers using nanoimprint lithography

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Feidenhans'l, Nikolaj Agentoft; Fisker-Bødker, Nis

    2011-01-01

    The biodegradable polymer poly(l-lactide) (PLLA) was introduced for the fabrication of micromechanical devices. For this purpose, thin biopolymer films with thickness around 10 μm were spin-coated on silicon substrates. Patterning of microcantilevers is achieved by nanoimprint lithography. A major...... challenge was the high adhesion between PLLA and silicon stamp. Optimized stamp fabrication and the deposition of a 125 nm thick fluorocarbon anti-stiction coating on the PLLA allowed the fabrication of biopolymer cantilevers. Resonance frequency measurements were used to estimate the Young’s modulus...

  12. Roll-to-roll UV imprint lithography for flexible electronics

    NARCIS (Netherlands)

    Maury, P.; Turkenburg, D.H.; Stroeks, N.; Giesen, P.; Barbu, I.; Meinders, E.R.; Bremen, A. van; Iosad, N.; Werf, R. van der; Onvlee, H.

    2011-01-01

    We propose a roll-to-roll UV imprint lithography tool as a way to pattern flexible PET foil with µm-resolution. As a way to overcome dimensional instability of the foil and its effect on overlay, a self-align approach was investigated, that permits to make several layers in a single lithography

  13. Manipulation of heat-diffusion channel in laser thermal lithography.

    Science.gov (United States)

    Wei, Jingsong; Wang, Yang; Wu, Yiqun

    2014-12-29

    Laser thermal lithography is a good alternative method for forming small pattern feature size by taking advantage of the structural-change threshold effect of thermal lithography materials. In this work, the heat-diffusion channels of laser thermal lithography are first analyzed, and then we propose to manipulate the heat-diffusion channels by inserting thermal conduction layers in between channels. Heat-flow direction can be changed from the in-plane to the out-of-plane of the thermal lithography layer, which causes the size of the structural-change threshold region to become much smaller than the focused laser spot itself; thus, nanoscale marks can be obtained. Samples designated as "glass substrate/thermal conduction layer/thermal lithography layer (100 nm)/thermal conduction layer" are designed and prepared. Chalcogenide phase-change materials are used as thermal lithography layer, and Si is used as thermal conduction layer to manipulate heat-diffusion channels. Laser thermal lithography experiments are conducted on a home-made high-speed rotation direct laser writing setup with 488 nm laser wavelength and 0.90 numerical aperture of converging lens. The writing marks with 50-60 nm size are successfully obtained. The mark size is only about 1/13 of the focused laser spot, which is far smaller than that of the light diffraction limit spot of the direct laser writing setup. This work is useful for nanoscale fabrication and lithography by exploiting the far-field focusing light system.

  14. Focal relationships and the environment of project marketing. A literature review with suggestions for practitioners and future research

    DEFF Research Database (Denmark)

    Skaates, Maria Anne; Tikkanen, Henrikki

    2000-01-01

    of the review is upon the connection between focal relationships and the wider environment in which project marketing and systems selling takes place. First, several common definitions of projects and project marketing are presented and discussed. Second, the implications of three specific features of project......Project marketing is an important mode of business-to-business marketing today. This paper assesses recent project marketing contributions, including predominantly those of members of the (mainly European) International Network for Project Marketing and Systems Selling (INPM). The emphasis...... business - discontinuity, uniqueness, and complexity - for the focal relationship and the broader marketing environment are considered at the level of multiple projects. Third, three overlapping types of postures that project-selling firms can adopt in relation to their focal relationships...

  15. Deep X-ray lithography for the fabrication of microstructures at ELSA

    Energy Technology Data Exchange (ETDEWEB)

    Pantenburg, F.J. E-mail: pantenburg@imt.fzk.de; Mohr, J

    2001-07-21

    Two beamlines at the Electron Stretcher Accelerator (ELSA) of Bonn University are dedicated for the production of microstructures by deep X-ray lithography with synchrotron radiation. They are equipped with state-of-the-art X-ray scanners, maintained and used by Forschungszentrum Karlsruhe. Polymer microstructure heights between 30 and 3000 {mu}m are manufactured regularly for research and industrial projects. This requires different characteristic energies. Therefore, ELSA operates routinely at 1.6, 2.3 and 2.7 GeV, for high-resolution X-ray mask fabrication, deep and ultra-deep X-ray lithography, respectively. The experimental setup, as well as the structure quality of deep and ultra deep X-ray lithographic microstructures are described.

  16. Laser-produced plasma-extreme ultraviolet light source for next generation lithography

    International Nuclear Information System (INIS)

    Nishihara, Katsunobu; Nishimura, Hiroaki; Gamada, Kouhei; Murakami, Masakatsu; Mochizuki, Takayasu; Sasaki, Akira; Sunahara, Atsushi

    2005-01-01

    Extreme ultraviolet (EUV) lithography is the most promising candidate for the next generation lithography for the 45 nm technology node and below. EUV light sources under consideration use 13.5 nm radiations from multicharged xenon, tin and lithium ions, because Mo/Si multiplayer mirrors have high reflectivity at this wavelength. A review of laser-produced plasma (LPP) EUV light sources is presented with a focus on theoretical and experimental studies under the auspices of the Leading Project promoted by MEXT. We discuss three theoretical topics: atomic processes in the LPP-EUV light source, conversion efficiency from laser light to EUV light at 13.5 nm wave-length with 2% bound width, and fast ion spectra. The properties of EUV emission from tin and xenon plasmas are also shown based on experimental results. (author)

  17. Deep X-ray lithography for the fabrication of microstructures at ELSA

    Science.gov (United States)

    Pantenburg, F. J.; Mohr, J.

    2001-07-01

    Two beamlines at the Electron Stretcher Accelerator (ELSA) of Bonn University are dedicated for the production of microstructures by deep X-ray lithography with synchrotron radiation. They are equipped with state-of-the-art X-ray scanners, maintained and used by Forschungszentrum Karlsruhe. Polymer microstructure heights between 30 and 3000 μm are manufactured regularly for research and industrial projects. This requires different characteristic energies. Therefore, ELSA operates routinely at 1.6, 2.3 and 2.7 GeV, for high-resolution X-ray mask fabrication, deep and ultra-deep X-ray lithography, respectively. The experimental setup, as well as the structure quality of deep and ultra deep X-ray lithographic microstructures are described.

  18. Deep X-ray lithography for the fabrication of microstructures at ELSA

    International Nuclear Information System (INIS)

    Pantenburg, F.J.; Mohr, J.

    2001-01-01

    Two beamlines at the Electron Stretcher Accelerator (ELSA) of Bonn University are dedicated for the production of microstructures by deep X-ray lithography with synchrotron radiation. They are equipped with state-of-the-art X-ray scanners, maintained and used by Forschungszentrum Karlsruhe. Polymer microstructure heights between 30 and 3000 μm are manufactured regularly for research and industrial projects. This requires different characteristic energies. Therefore, ELSA operates routinely at 1.6, 2.3 and 2.7 GeV, for high-resolution X-ray mask fabrication, deep and ultra-deep X-ray lithography, respectively. The experimental setup, as well as the structure quality of deep and ultra deep X-ray lithographic microstructures are described

  19. Deep X-ray lithography for the fabrication of microstructures at ELSA

    CERN Document Server

    Pantenburg, F J

    2001-01-01

    Two beamlines at the Electron Stretcher Accelerator (ELSA) of Bonn University are dedicated for the production of microstructures by deep X-ray lithography with synchrotron radiation. They are equipped with state-of-the-art X-ray scanners, maintained and used by Forschungszentrum Karlsruhe. Polymer microstructure heights between 30 and 3000 mu m are manufactured regularly for research and industrial projects. This requires different characteristic energies. Therefore, ELSA operates routinely at 1.6, 2.3 and 2.7 GeV, for high-resolution X-ray mask fabrication, deep and ultra-deep X-ray lithography, respectively. The experimental setup, as well as the structure quality of deep and ultra deep X-ray lithographic microstructures are described.

  20. Driving imaging and overlay performance to the limits with advanced lithography optimization

    Science.gov (United States)

    Mulkens, Jan; Finders, Jo; van der Laan, Hans; Hinnen, Paul; Kubis, Michael; Beems, Marcel

    2012-03-01

    Immersion lithography is being extended to 22-nm and even below. Next to generic scanner system improvements, application specific solutions are needed to follow the requirements for CD control and overlay. Starting from the performance budgets, this paper discusses how to improve (in volume manufacturing environment) CDU towards 1-nm and overlay towards 3-nm. The improvements are based on deploying the actuator capabilities of the immersion scanner. The latest generation immersion scanners have extended the correction capabilities for overlay and imaging, offering freeform adjustments of lens, illuminator and wafer grid. In order to determine the needed adjustments the recipe generation per user application is based on a combination wafer metrology data and computational lithography methods. For overlay, focus and CD metrology we use an angle resolved optical scatterometer.

  1. An electron undulating ring for VLSI lithography

    International Nuclear Information System (INIS)

    Tomimasu, T.; Mikado, T.; Noguchi, T.; Sugiyama, S.; Yamazaki, T.

    1985-01-01

    The development of the ETL storage ring ''TERAS'' as an undulating ring has been continued to achieve a wide area exposure of synchrotron radiation (SR) in VLSI lithography. Stable vertical and horizontal undulating motions of stored beams are demonstrated around a horizontal design orbit of TERAS, using two small steering magnets of which one is used for vertical undulating and another for horizontal one. Each steering magnet is inserted into one of the periodic configulation of guide field elements. As one of useful applications of undulaing electron beams, a vertically wide exposure of SR has been demonstrated in the SR lithography. The maximum vertical deviation from the design orbit nCcurs near the steering magnet. The maximum vertical tilt angle of the undulating beam near the nodes is about + or - 2mrad for a steering magnetic field of 50 gauss. Another proposal is for hith-intensity, uniform and wide exposure of SR from a wiggler installed in TERAS, using vertical and horizontal undulating motions of stored beams. A 1.4 m long permanent magnet wiggler has been installed for this purpose in this April

  2. Advanced coatings for next generation lithography

    Science.gov (United States)

    Naujok, P.; Yulin, S.; Kaiser, N.; Tünnermann, A.

    2015-03-01

    Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be reached in near future. The authors will prove that transition from conventional La/B4C to promising LaN/B4C multilayer coatings leads to enhanced optical properties. Currently a near normal-incidence reflectivity of 58.1% @ 6.65 nm is achieved by LaN/B4C multilayer mirrors. The introduction of ultrathin diffusion barriers into the multilayer design to reach the targeted reflectivity of 70% was also tested. The optimization of multilayer design and deposition process for interface-engineered La/C/B4C multilayer mirrors resulted in peak reflectivity of 56.8% at the wavelength of 6.66 nm. In addition, the thermal stability of several selected multilayers was investigated and will be discussed.

  3. Communication, coordination and cooperation in construction projects: business environment and human behaviours

    Science.gov (United States)

    Salah Alaloul, Wesam; Shahir Liew, Mohd; Zawawi, Noor Amila Wan

    2017-12-01

    The accomplishment of construction projects is extremely dependent on the integration of several stakeholders; therefore none of them has the control or the ability to accomplish the project alone. Each of them may influence and be influenced by the project management approach. There is no comprehensive theoretical platform for defining Communication, Coordination and Cooperation (3Cs) in the management of construction project. This paper deliberates the function of the 3Cs different theoretical perceptions. Through an analysis of selected articles from reputable academic journals in construction management, the business environment and human behaviour were identified as two main parts. A little has been done so far about the 3Cs, and how they are correlated with construction projects performance. Therefore, the objective of this paper is to explain the definitions and the association between the 3Cs. There is a significant link between communication and coordination. Coordination alternatively, is trust-based a logic of mutual and exchange. Consequently, cooperation is much more sophisticated, which needing more time and attempts.

  4. Challenges in Projecting Sea Level Rise impacts on the Coastal Environment of South Florida (Invited)

    Science.gov (United States)

    Obeysekera, J.; Park, J.; Irizarry-Ortiz, M. M.; Barnes, J. A.; Trimble, P.; Said, W.

    2010-12-01

    Due to flat topography, a highly transmissive groundwater aquifer, and a growing population with the associated infrastructure, South Florida’s coastal environment is one of the most vulnerable areas to sea level rise. Current projections of sea level rise and the associated storm surges will have direct impacts on coastal beaches and infrastructure, flood protection, freshwater aquifers, and both the isolated and regional wetlands. Uncertainties in current projections have made it difficult for regional and local governments to develop adaptation strategies as such measures will depend heavily on the temporal and spatial patterns of sea level rise in the coming decades. We demonstrate the vulnerability of both the built and natural environments of the coastal region and present the current efforts to understand and predict the sea level rise estimate that management agencies could employ in planning of adaptation strategies. In particular, the potential vulnerabilities of the flood control system as well as the threat to the water supply wellfields in the coastal belt will be presented. In an effort to understand the historical variability of sea level rise, we present linkages to natural phenomena such as Atlantic Multi-Decadal Oscillation, and the analytical methods we have developed to provide probabilistic projections of both mean sea level rise and the extremes.

  5. An investigation of Chinese attitudes toward the environment: case study using the Grain for Green Project.

    Science.gov (United States)

    Cao, Shixiong; Chen, Li; Liu, Zhande

    2009-02-01

    China is the world's most populous country and has one of the largest territories. As such, Chinese attitudes and behavior with regard to environmental issues are key factors in protecting the world's natural resources and environment. In this study, we surveyed a random sample of 5000 citizens from six Chinese provinces (Beijing, Shanghai, Hubei, Hunan, Henan, and Shaanxi) to understand their environmental attitudes, contrasts between the attitudes of citizens in different demographic groups, and their willingness to invest in environmental conservation. The results indicated that policymakers and the public increasingly recognize the key role that environmental restoration plays in protecting the overall health of the environment. In total, 91% of the interviewees believed that the environment had deteriorated severely during the past decade, compared with 44% in a 1999 survey. In addition, 78% of the interviewees supported their government's investment of more than 300 billion RMB (approximately 10% of total government revenues in 2004) in the "Grain for Green Project", which discouraged unsustainable land use by compensating farmers and herders for abandoning farming and grazing on marginal land. There was a strong correlation between environmental attitudes and net income and education levels, and other differences were based on the respondents' age, gender, job, and location. Net income and education level were the key factors that affected environmental attitudes. Based on these results, we propose that successful environmental restoration projects must include both an education component and an economic development component.

  6. Teaching, Doing, and Sharing Project Management in a Studio Environment: The Development of an Instructional Design Open-Source Project Management Textbook

    Science.gov (United States)

    Randall, Daniel L.; Johnson, Jacquelyn C.; West, Richard E.; Wiley, David A.

    2013-01-01

    In this article, the authors present an example of a project-based course within a studio environment that taught collaborative innovation skills and produced an open-source project management textbook for the field of instructional design and technology. While innovation plays an important role in our economy, and many have studied how to teach…

  7. Innovative SU-8 Lithography Techniques and Their Applications

    Directory of Open Access Journals (Sweden)

    Jeong Bong Lee

    2014-12-01

    Full Text Available SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters high-aspect-ratio (up to 100:1 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

  8. Eye Gaze Controlled Projected Display in Automotive and Military Aviation Environments

    Directory of Open Access Journals (Sweden)

    Gowdham Prabhakar

    2018-01-01

    Full Text Available This paper presents an eye gaze controlled projected display that can be used in aviation and automotive environment as a head up display. We have presented details of the hardware and software used in developing the display and an algorithm to improve performance of point and selection tasks in eye gaze controlled graphical user interface. The algorithm does not require changing layout of an interface; it rather puts a set of hotspots on clickable targets using a Simulated Annealing algorithm. Four user studies involving driving and flight simulators have found that the proposed projected display can improve driving and flying performance and significantly reduce pointing and selection times for secondary mission control tasks compared to existing interaction systems.

  9. Extension of optical lithography by mask-litho integration with computational lithography

    Science.gov (United States)

    Takigawa, T.; Gronlund, K.; Wiley, J.

    2010-05-01

    Wafer lithography process windows can be enlarged by using source mask co-optimization (SMO). Recently, SMO including freeform wafer scanner illumination sources has been developed. Freeform sources are generated by a programmable illumination system using a micro-mirror array or by custom Diffractive Optical Elements (DOE). The combination of freeform sources and complex masks generated by SMO show increased wafer lithography process window and reduced MEEF. Full-chip mask optimization using source optimized by SMO can generate complex masks with small variable feature size sub-resolution assist features (SRAF). These complex masks create challenges for accurate mask pattern writing and low false-defect inspection. The accuracy of the small variable-sized mask SRAF patterns is degraded by short range mask process proximity effects. To address the accuracy needed for these complex masks, we developed a highly accurate mask process correction (MPC) capability. It is also difficult to achieve low false-defect inspections of complex masks with conventional mask defect inspection systems. A printability check system, Mask Lithography Manufacturability Check (M-LMC), is developed and integrated with 199-nm high NA inspection system, NPI. M-LMC successfully identifies printable defects from all of the masses of raw defect images collected during the inspection of a complex mask. Long range mask CD uniformity errors are compensated by scanner dose control. A mask CD uniformity error map obtained by mask metrology system is used as input data to the scanner. Using this method, wafer CD uniformity is improved. As reviewed above, mask-litho integration technology with computational lithography is becoming increasingly important.

  10. Immersion lithography defectivity analysis at DUV inspection wavelength

    Science.gov (United States)

    Golan, E.; Meshulach, D.; Raccah, N.; Yeo, J. Ho.; Dassa, O.; Brandl, S.; Schwarz, C.; Pierson, B.; Montgomery, W.

    2007-03-01

    Significant effort has been directed in recent years towards the realization of immersion lithography at 193nm wavelength. Immersion lithography is likely a key enabling technology for the production of critical layers for 45nm and 32nm design rule (DR) devices. In spite of the significant progress in immersion lithography technology, there remain several key technology issues, with a critical issue of immersion lithography process induced defects. The benefits of the optical resolution and depth of focus, made possible by immersion lithography, are well understood. Yet, these benefits cannot come at the expense of increased defect counts and decreased production yield. Understanding the impact of the immersion lithography process parameters on wafer defects formation and defect counts, together with the ability to monitor, control and minimize the defect counts down to acceptable levels is imperative for successful introduction of immersion lithography for production of advanced DR's. In this report, we present experimental results of immersion lithography defectivity analysis focused on topcoat layer thickness parameters and resist bake temperatures. Wafers were exposed on the 1150i-α-immersion scanner and 1200B Scanner (ASML), defect inspection was performed using a DUV inspection tool (UVision TM, Applied Materials). Higher sensitivity was demonstrated at DUV through detection of small defects not detected at the visible wavelength, indicating on the potential high sensitivity benefits of DUV inspection for this layer. The analysis indicates that certain types of defects are associated with different immersion process parameters. This type of analysis at DUV wavelengths would enable the optimization of immersion lithography processes, thus enabling the qualification of immersion processes for volume production.

  11. Grey relation projection model for evaluating permafrost environment in the Muli coal mining area, China

    Energy Technology Data Exchange (ETDEWEB)

    Wei Cao; Yu Sheng; Yinghong Qin; Jing Li; Jichun Wu [Chinese Academy of Sciences, Lanzhou (China). State Key Laboratory of Frozen Soil Engineering

    2010-12-15

    This study attempts to estimate the current stage of the permafrost environment in the Muli coal mining area, an opencast mining site in the Qinghai-Tibet plateau, China. The estimation is done by regarding this site's permafrost environment as a system which was divided into three subsystems consisting of permafrost freeze-thaw erosion sensibility, permafrost thermal stability, and permafrost ecological fragility. The subsystems were characterized with their influencing indicators, each of which was assigned with a weight according to analytic hierarchy process. The relationship between these indictors is established using an environmental evaluation model based on grey system theory. The evaluated results show that currently the normalised grey relation projection values (GRPV) of permafrost freezing-thawing erosion sensibility, permafrost thermal stability, permafrost ecological fragility and permafrost environment are 0.58 (general situation), 0.47 (bad situation), 0.63 (general situation) and 0.56 (general situation), respectively. These values imply that the permafrost environment has been deteriorated to a certain degree by human activities and potentially could be further degraded. However, at this degree, a new equilibrium could be achieved if the current environmental degradation ratio is held and if effective treatments are constructed against further damages.

  12. Inventory of Federal energy-related environment and safety research for FY 1978. Volume II. Project listings and indexes

    Energy Technology Data Exchange (ETDEWEB)

    None

    1979-12-01

    This volume contains summaries of FY-1978 government-sponsored environment and safety research related to energy. Project summaries were collected by Aerospace Corporation under contract with the Department of Energy, Office of Program Coordination, under the Assistant Secretary for Environment. Summaries are arranged by log number, which groups the projects by reporting agency. The log number is a unique number assigned to each project from a block of numbers set aside for each agency. Information about the projects is included in the summary listings. This includes the project title, principal investigators, research organization, project number, contract number, supporting organization, funding level if known, related energy sources with numbers indicating percentages of effort devoted to each, and R and D categories. A brief description of each project is given, and this is followed by subject index terms that were assigned for computer searching and for generating the printed subject index in Volume IV.

  13. Inventory of Federal energy-related environment and safety research for FY 1978. Volume II. Project listings and indexes

    International Nuclear Information System (INIS)

    1979-12-01

    This volume contains summaries of FY-1978 government-sponsored environment and safety research related to energy. Project summaries were collected by Aerospace Corporation under contract with the Department of Energy, Office of Program Coordination, under the Assistant Secretary for Environment. Summaries are arranged by log number, which groups the projects by reporting agency. The log number is a unique number assigned to each project from a block of numbers set aside for each agency. Information about the projects is included in the summary listings. This includes the project title, principal investigators, research organization, project number, contract number, supporting organization, funding level if known, related energy sources with numbers indicating percentages of effort devoted to each, and R and D categories. A brief description of each project is given, and this is followed by subject index terms that were assigned for computer searching and for generating the printed subject index in Volume IV

  14. Sequential infiltration synthesis for advanced lithography

    Energy Technology Data Exchange (ETDEWEB)

    Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih; Peng, Qing

    2017-10-10

    A plasma etch resist material modified by an inorganic protective component via sequential infiltration synthesis (SIS) and methods of preparing the modified resist material. The modified resist material is characterized by an improved resistance to a plasma etching or related process relative to the unmodified resist material, thereby allowing formation of patterned features into a substrate material, which may be high-aspect ratio features. The SIS process forms the protective component within the bulk resist material through a plurality of alternating exposures to gas phase precursors which infiltrate the resist material. The plasma etch resist material may be initially patterned using photolithography, electron-beam lithography or a block copolymer self-assembly process.

  15. Recent advances in X-ray lithography

    International Nuclear Information System (INIS)

    Cerrina, F.

    1992-01-01

    We report some significant developments in the area of X-ray technology, in the area of the modeling of image formation, in distortion control and in mask replication. Early simple models have been replaced by complete optical calculations based on physical optics and including all relevant factors. These models provide good agreement with the available experimental results. In the area of mask distortions, the use of finite element analysis models has clarified the roles played by the various sources of stress and explained in greater detail the origin of temperature changes. These progress have paved the way to the optimization of the exposure system and to the achievement of the large exposure latitude potential of X-ray lithography. (author)

  16. Inclined nanoimprinting lithography for 3D nanopatterning

    International Nuclear Information System (INIS)

    Liu Zhan; Bucknall, David G; Allen, Mark G

    2011-01-01

    We report a non-conventional shear-force-driven nanofabrication approach, inclined nanoimprint lithography (INIL), for producing 3D nanostructures of varying heights on planar substrates in a single imprinting step. Such 3D nanostructures are fabricated by exploiting polymer anisotropic dewetting where the degree of anisotropy can be controlled by the magnitude of the inclination angle. The feature size is reduced from micron scale of the template to a resultant nanoscale pattern. The underlying INIL mechanism is investigated both experimentally and theoretically. The results indicate that the shear force generated at a non-zero inclination angle induced by the INIL apparatus essentially leads to asymmetry in the polymer flow direction ultimately resulting in 3D nanopatterns with different heights. INIL removes the requirements in conventional nanolithography of either utilizing 3D templates or using multiple lithographic steps. This technique enables various 3D nanoscale devices including angle-resolved photonic and plasmonic crystals to be fabricated.

  17. Illumination system for X-ray lithography

    International Nuclear Information System (INIS)

    Buckley, W.D.

    1989-01-01

    An X-ray lithography system is described, comprising: a point source of X-Ray radiation; a wafer plane disposed in spaced relation to the point source of X-Ray radiation; a mask disposed between the point source of X-Ray radiation and the wafer plane whereby X-Ray radiation from the point source of X-ray radiation passes through the mask to the water plane; and X-Ray absorbent means mounted between the point source of X-Ray radiation and the wafer plane, the X-Ray absorbent means being of quadratically absorption from maximum absorption at the center to minimum absorption at the edge so as to have a radial absorption gradient profile to compensate for radial flux variation of the X-Ray radiation

  18. Accelerated yield learning in agressive lithography

    Science.gov (United States)

    Monahan, Kevin M.; Ashkenaz, Scott M.; Chen, Xing; Lord, Patrick J.; Merrill, Mark A.; Quattrini, Rich; Wiley, James N.

    2000-06-01

    As exposure wavelengths decrease from 248 nm to 193, 157, and even 13 nm (EUV), small process defects can cause collapse of the lithographic process window near the limits of resolution, particularly for the gate and contact structures in high- performance devices. Such sensitivity poses a challenge for lithography process module control. In this work, we show that yield loss can be caused by a combination of macro, micro, CD, and overlay defects. A defect is defined as any yield- affecting process variation. Each defect, regardless of cause, is assumed to have a specific 'kill potential.' The accuracy of the lithographic yield model can be improved by identifying those defects with the highest kill potential or, more importantly, those that pose the highest economic risk. Such economic considerations have led us to develop a simple heuristic model for understanding sampling strategies in defect metrology and for linking metrology capability to yield and profitability.

  19. A simple electron-beam lithography system

    DEFF Research Database (Denmark)

    Mølhave, Kristian; Madsen, Dorte Nørgaard; Bøggild, Peter

    2005-01-01

    A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit...... of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can...... be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved....

  20. Implementation and benefits of advanced process control for lithography CD and overlay

    Science.gov (United States)

    Zavyalova, Lena; Fu, Chong-Cheng; Seligman, Gary S.; Tapp, Perry A.; Pol, Victor

    2003-05-01

    Due to the rapidly reduced imaging process windows and increasingly stingent device overlay requirements, sub-130 nm lithography processes are more severely impacted than ever by systamic fault. Limits on critical dimensions (CD) and overlay capability further challenge the operational effectiveness of a mix-and-match environment using multiple lithography tools, as such mode additionally consumes the available error budgets. Therefore, a focus on advanced process control (APC) methodologies is key to gaining control in the lithographic modules for critical device levels, which in turn translates to accelerated yield learning, achieving time-to-market lead, and ultimately a higher return on investment. This paper describes the implementation and unique challenges of a closed-loop CD and overlay control solution in high voume manufacturing of leading edge devices. A particular emphasis has been placed on developing a flexible APC application capable of managing a wide range of control aspects such as process and tool drifts, single and multiple lot excursions, referential overlay control, 'special lot' handling, advanced model hierarchy, and automatic model seeding. Specific integration cases, including the multiple-reticle complementary phase shift lithography process, are discussed. A continuous improvement in the overlay and CD Cpk performance as well as the rework rate has been observed through the implementation of this system, and the results are studied.

  1. Suspended liquid subtractive lithography: printing three dimensional channels directly into uncured PDMS

    Science.gov (United States)

    Helmer, D.; Voigt, A.; Wagner, S.; Keller, N.; Sachsenheimer, K.; Kotz, F.; Nargang, T. M.; Rapp, B. E.

    2018-02-01

    Polydimethylsiloxane (PDMS) is one of the most widely used polymers for the generation of microfluidic chips. The standard procedures of soft lithography require the formation of a new master structure for every design which is timeconsuming and expensive. All channel generated by soft lithography need to be consecutively sealed by bonding which is a process that can proof to be hard to control. Channel cross-sections are largely restricted to squares or flat-topped designs and the generation of truly three-dimensional designs is not straightforward. Here we present Suspended Liquid Subtractive Lithography (SLSL) a method for generating microfluidic channels of nearly arbitrary three-dimensional structures in PDMS that do not require master formation or bonding and give circular channel cross sections which are especially interesting for mimicking in vivo environments. In SLSL, an immiscible liquid is introduced into the uncured PDMS by a capillary mounted on a 3D printer head. The liquid forms continuous "threads" inside the matrix thus creating void suspended channel structures.

  2. Integrating nanosphere lithography in device fabrication

    Science.gov (United States)

    Laurvick, Tod V.; Coutu, Ronald A.; Lake, Robert A.

    2016-03-01

    This paper discusses the integration of nanosphere lithography (NSL) with other fabrication techniques, allowing for nano-scaled features to be realized within larger microelectromechanical system (MEMS) based devices. Nanosphere self-patterning methods have been researched for over three decades, but typically not for use as a lithography process. Only recently has progress been made towards integrating many of the best practices from these publications and determining a process that yields large areas of coverage, with repeatability and enabled a process for precise placement of nanospheres relative to other features. Discussed are two of the more common self-patterning methods used in NSL (i.e. spin-coating and dip coating) as well as a more recently conceived variation of dip coating. Recent work has suggested the repeatability of any method depends on a number of variables, so to better understand how these variables affect the process a series of test vessels were developed and fabricated. Commercially available 3-D printing technology was used to incrementally alter the test vessels allowing for each variable to be investigated individually. With these deposition vessels, NSL can now be used in conjunction with other fabrication steps to integrate features otherwise unattainable through current methods, within the overall fabrication process of larger MEMS devices. Patterned regions in 1800 series photoresist with a thickness of ~700nm are used to capture regions of self-assembled nanospheres. These regions are roughly 2-5 microns in width, and are able to control the placement of 500nm polystyrene spheres by controlling where monolayer self-assembly occurs. The resulting combination of photoresist and nanospheres can then be used with traditional deposition or etch methods to utilize these fine scale features in the overall design.

  3. Project Stakeholder Management in the clinical research environment: how to do it right.

    Directory of Open Access Journals (Sweden)

    Seithikurippu R. Pandi-Perumal

    2015-05-01

    Full Text Available This review introduces a conceptual framework for understanding stakeholder management in the clinical and community-based research environment. In recent years, an evolution in practice has occurred in which many applicants for public and non-governmental funding of public health research in hospital settings. Community health research projects are inherently complex, have sought to involve patients and other stakeholders in the center of the research process. Substantial evidence has now been provided that stakeholder involvement is essential for management effectiveness in clinical research. Feedback from stakeholders has critical value for research managers inasmuch as it alerts them to the social, environmental and ethical implications of research activities. Additionally those who are directly affected by program development and clinical research, the patients, their families, and others, almost universally have a strong motivation to be involved in the planning and execution of new program changes. The current overview introduces a conceptual framework for stakeholder management in the clinical research environment and offers practical suggestions for fostering meaningful stakeholder engagement. The fifth edition of PMBOK® of the Project Management Institute (PMI, has served as basis for many of the suggested guidelines that are put forward in this article.

  4. Project Stakeholder Management in the Clinical Research Environment: How to Do it Right

    Science.gov (United States)

    Pandi-Perumal, Seithikurippu R.; Akhter, Sohel; Zizi, Ferdinard; Jean-Louis, Girardin; Ramasubramanian, Chellamuthu; Edward Freeman, R.; Narasimhan, Meera

    2015-01-01

    This review introduces a conceptual framework for understanding stakeholder management (ShM) in the clinical and community-based research environment. In recent years, an evolution in practice has occurred in many applicants for public and non-governmental funding of public health research in hospital settings. Community health research projects are inherently complex, have sought to involve patients and other stakeholders in the center of the research process. Substantial evidence has now been provided that stakeholder involvement is essential for management effectiveness in clinical research. Feedback from stakeholders has critical value for research managers inasmuch as it alerts them to the social, environmental, and ethical implications of research activities. Additionally, those who are directly affected by program development and clinical research, the patients, their families, and others, almost universally have a strong motivation to be involved in the planning and execution of new program changes. The current overview introduces a conceptual framework for ShM in the clinical research environment and offers practical suggestions for fostering meaningful stakeholder engagement. The fifth edition of PMBOK® of the Project Management Institute, has served as basis for many of the suggested guidelines that are put forward in this article. PMID:26042053

  5. VREPAR projects: the use of virtual environments in psycho-neuro-physiological assessment and rehabilitation.

    Science.gov (United States)

    Riva, G; Bacchetta, M; Baruffi, M; Borgomainerio, E; Defrance, C; Gatti, F; Galimberti, C; Fontaneto, S; Marchi, S; Molinari, E; Nugues, P; Rinaldi, S; Rovetta, A; Ferretti, G S; Tonci, A; Wann, J; Vincelli, F

    1999-01-01

    Due, in large part, to the significant advances in PC hardware that have been made over the last 3 years, PC-based virtual environments are approaching reality. Virtual Reality Environments for Psychoneurophysiological Assessment and Rehabilitation (VREPAR) are two European Community funded projects (Telematics for health-HC 1053/HC 1055, http:// www.psicologia.net) that are trying to develop a PC-based virtual reality system (PC-VRS) for the medical market that can be marketed at a price that is accessible to its possible endusers (hospitals, universities, and research centres) and that would have the modular, connectability, and interoperability characteristics that the existing systems lack. In particular, the projects are developing three hardware/software modules for the application of the PCVRS in psycho-neuro-physiological assessment and rehabilitation. The chosen development areas are eating disorders (bulimia, anorexia, and obesity), movement disorders (Parkinson's disease and torsion dystonia) and stroke disorders (unilateral neglect and hemiparesis). This article describes the rationale of the modules and the preliminary results obtained.

  6. Project Stakeholder Management in the Clinical Research Environment: How to Do it Right.

    Science.gov (United States)

    Pandi-Perumal, Seithikurippu R; Akhter, Sohel; Zizi, Ferdinard; Jean-Louis, Girardin; Ramasubramanian, Chellamuthu; Edward Freeman, R; Narasimhan, Meera

    2015-01-01

    This review introduces a conceptual framework for understanding stakeholder management (ShM) in the clinical and community-based research environment. In recent years, an evolution in practice has occurred in many applicants for public and non-governmental funding of public health research in hospital settings. Community health research projects are inherently complex, have sought to involve patients and other stakeholders in the center of the research process. Substantial evidence has now been provided that stakeholder involvement is essential for management effectiveness in clinical research. Feedback from stakeholders has critical value for research managers inasmuch as it alerts them to the social, environmental, and ethical implications of research activities. Additionally, those who are directly affected by program development and clinical research, the patients, their families, and others, almost universally have a strong motivation to be involved in the planning and execution of new program changes. The current overview introduces a conceptual framework for ShM in the clinical research environment and offers practical suggestions for fostering meaningful stakeholder engagement. The fifth edition of PMBOK(®) of the Project Management Institute, has served as basis for many of the suggested guidelines that are put forward in this article.

  7. United Nations Environment Programme Capacity Building Pilot Project - Training on persistent organic pollutant analysis under the Stockholm Convention

    NARCIS (Netherlands)

    de Boer, J.; Leslie, H.A.; van Leeuwen, S.P.J.; Wegener, J.W.M.; van Bavel, B; Lindstrom, G.; Lahoutifard, N.; Fiedler, H.

    2008-01-01

    Within the framework of a United Nations Environment Programme (UNEP) Capacity Building Project for training of laboratory staff in developing countries on persistent organic pollutant (POP) analysis, an interlaboratory study was organised following an initial evaluation of the performance of

  8. OPEN RADIATION: a collaborative project for radioactivity measurement in the environment by the public

    Science.gov (United States)

    Bottollier-Depois, Jean-François; Allain, E.; Baumont, G.; Berthelot, N.; Clairand, I.; Couvez, C.; Darley, G.; Henry, B.; Jolivet, T.; Laroche, P.; Lebau-Livé, A.; Lejeune, V.; Miss, J.; Monange, W.; Quéinnec, F.; Richet, Y.; Simon, C.; Trompier, F.; Vayron, F.

    2017-09-01

    After the Fukushima accident, initiatives emerged from the public to carry out themselves measurements of the radioactivity in the environment with various devices, among which smartphones, and to share data and experiences through collaborative tools and social networks. Such measurements have two major interests, on the one hand, to enable each individual of the public to assess his own risk regarding the radioactivity and, on the other hand, to provide "real time" data from the field at various locations, especially in the early phase of an emergency situation, which could be very useful for the emergency management. The objective of the OPENRADIATION project is to offer to the public the opportunity to be an actor for measurements of the radioactivity in the environment using connected dosimetric applications on smartphones. The challenge is to operate such a system on a sustainable basis in peaceful time and be useful in case of emergency. In "peaceful situation", this project is based on a collaborative approach with the aim to get complementary data to the existing ones, to consolidate the radiation background, to generate alerts in case of problem and to provide education & training and enhanced pedagogical approaches for a clear understanding of measures for the public. In case of emergency situation, data will be available "spontaneously" from the field in "real time" providing an opportunity for the emergency management and the communication with the public. … The practical objective is i) to develop a website centralising data from various systems/dosimeters, providing dose maps with raw and filtered data and creating dedicated areas for specific initiatives and exchanges of data and ii) to develop a data acquisition protocol and a dosimetric application using a connected dosimeter with a bluetooth connection. This project is conducted within a partnership between organisms' representative of the scientific community and associations to create links

  9. On an interesting project with hybrid ventilation in an urban environment with heavy traffic

    International Nuclear Information System (INIS)

    Mysen, Mads

    2001-01-01

    Kampen school, built in 1888, is located centrally in Oslo, Norway. Problematic indoor climate made it necessary to rehabilitate the school. This rehabilitation project is used as a 'case' in a large international research project that deals with energy-efficient rehabilitation of educational buildings. The project aims to (1) demonstrate that schools can be rehabilitated by means of ventilation systems that exploit the natural driving forces without this entailing considerable extra costs, (2) demonstrate that natural sunlight can be utilized as an energy-conserving measure at the same time as human need for daylight is satisfied, (3) demonstrate the importance of optimum selection of armatures and light sources with respect to energy and comfort, (4) demonstrate that these solutions imply reduced energy and maintenance costs such as to be profitable in a life-cycle perspective, (5) demonstrate that these solutions can inspire learning even in urban environments, and (6) demonstrate and exploit the potential for reduced energy consumption by demand-controlled ventilation and electric lighting according to area, natural driving forces and availability of daylight

  10. The Dust Management Project: Characterizing Lunar Environments and Dust, Developing Regolith Mitigation Technology and Simulants

    Science.gov (United States)

    Hyatt, Mark J.; Straka, Sharon A.

    2010-01-01

    A return to the Moon to extend human presence, pursue scientific activities, use the Moon to prepare for future human missions to Mars, and expand Earth?s economic sphere, will require investment in developing new technologies and capabilities to achieve affordable and sustainable human exploration. From the operational experience gained and lessons learned during the Apollo missions, conducting long-term operations in the lunar environment will be a particular challenge, given the difficulties presented by the unique physical properties and other characteristics of lunar regolith, including dust. The Apollo missions and other lunar explorations have identified significant lunar dust-related problems that will challenge future mission success. Comprised of regolith particles ranging in size from tens of nanometers to microns, lunar dust is a manifestation of the complex interaction of the lunar soil with multiple mechanical, electrical, and gravitational effects. The environmental and anthropogenic factors effecting the perturbation, transport, and deposition of lunar dust must be studied in order to mitigate it?s potentially harmful effects on exploration systems and human explorers. The Dust Management Project (DMP) is tasked with the evaluation of lunar dust effects, assessment of the resulting risks, and development of mitigation and management strategies and technologies related to Exploration Systems architectures. To this end, the DMP supports the overall goal of the Exploration Technology Development Program (ETDP) of addressing the relevant high priority technology needs of multiple elements within the Constellation Program (CxP) and sister ETDP projects. Project scope, plans, and accomplishments will be presented.

  11. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    DEFF Research Database (Denmark)

    Kehagias, N.; Reboud, V.; Chansin, G.

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer...... are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed...... polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three...

  12. Applications of Cold Cathode PIG Ion Source in Lithography

    International Nuclear Information System (INIS)

    Bassal, N.I.

    2012-01-01

    The cold cathode Penning ion source (PIG) of axial type could be modified to produce ion and electron beam with a considerable amount to use it in the lithography process. Lithography is a new applications of ion/electron beam at which one can use the ion/ or electron beam as a pencil to write and draw on a metal surface. The electron beam takes 1/3 the time needed for ion beam to make good picture. So that with the help of ion/or electron beam lithography one can mark tools, parts, instruments, and equipment with names, numbers, designs, trademark or brand name in few seconds. It is an easy process, quick and an inexpensive method. Firstly, operating characteristics of this ion source is studied. Lithography application of ion source with optimum conditions is done. Later, the hardness and the tensile strength is measured and each of them increases with increasing time

  13. Laser interference lithography with highly accurate interferometric alignment

    NARCIS (Netherlands)

    van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo; de Ridder, R.M.; Worhoff, Kerstin; Lambeck, Paul

    It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

  14. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    International Nuclear Information System (INIS)

    Kehagias, N; Reboud, V; Chansin, G; Zelsmann, M; Jeppesen, C; Schuster, C; Kubenz, M; Reuther, F; Gruetzner, G; Torres, C M Sotomayor

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional patterning. Three-dimensional woodpile-like structures were successfully fabricated with this new technique

  15. A Pilot Study: Facilitating Cross-Cultural Understanding with Project-Based Collaborative Learning in an Online Environment

    Science.gov (United States)

    Shadiev, Rustam; Hwang, Wu-Yuin; Huang, Yueh-Min

    2015-01-01

    This study investigated three aspects: how project-based collaborative learning facilitates cross-cultural understanding; how students perceive project-based collaborative learning implementation in a collaborative cyber community (3C) online environment; and what types of communication among students are used. A qualitative case study approach…

  16. Modular EUV Source for the next generation lithography

    International Nuclear Information System (INIS)

    Sublemontier, O.; Rosset-Kos, M.; Ceccotti, T.; Hergott, J.F.; Auguste, Th.; Normand, D.; Schmidt, M.; Beaumont, F.; Farcage, D.; Cheymol, G.; Le Caro, J.M.; Cormont, Ph.; Mauchien, P.; Thro, P.Y.; Skrzypczak, J.; Muller, S.; Marquis, E.; Barthod, B.; Gaurand, I.; Davenet, M.; Bernard, R.

    2011-01-01

    The present work, performed in the frame of the EXULITE project, was dedicated to the design and characterization of a laser-plasma-produced extreme ultraviolet (EUV) source prototype at 13.5 nm for the next generation lithography. It was conducted in cooperation with two laboratories from CEA, ALCATEL and THALES. One of our approach originalities was the laser scheme modularity. Six Nd:YAG laser beams were focused at the same time on a xenon filament jet to generate the EUV emitting plasma. Multiplexing has important industrial advantages and led to interesting source performances in terms of in-band power, stability and angular emission properties with the filament jet target. A maximum conversion efficiency (CE) value of 0.44% in 2π sr and 2% bandwidth was measured, which corresponds to a maximum in band EUV mean power of 7.7 W at a repetition rate of 6 kHz. The EUV emission was found to be stable and isotropic in these conditions. (authors)

  17. Investigating the Quality of Project-Based Science and Technology Learning Environments in Elementary School: A Critical Review of Instruments

    Science.gov (United States)

    Thys, Miranda; Verschaffel, Lieven; Van Dooren, Wim; Laevers, Ferre

    2016-01-01

    This paper provides a systematic review of instruments that have the potential to measure the quality of project-based science and technology (S&T) learning environments in elementary school. To this end, a comprehensive literature search was undertaken for the large field of S&T learning environments. We conducted a horizontal bottom-up…

  18. Interplay between Individual Creativity and Group Creativity in Problem and Project-Based Learning (PBL) Environment in Engineering Education

    DEFF Research Database (Denmark)

    Zhou, Chunfang; Kolmos, Anette

    2013-01-01

    Recent studies regard Problem and Project Based Learning (PBL) as providing a learning environment which fosters both individual and group creativity. This paper focuses on the question: In a PBL environment, how do students perceive the interplay between individual and group creativity? Empirica...

  19. Displacement Talbot lithography: an alternative technique to fabricate nanostructured metamaterials

    Science.gov (United States)

    Le Boulbar, E. D.; Chausse, P. J. P.; Lis, S.; Shields, P. A.

    2017-06-01

    Nanostructured materials are essential for many recent electronic, magnetic and optical devices. Lithography is the most common step used to fabricate organized and well calibrated nanostructures. However, feature sizes less than 200 nm usually require access to deep ultraviolet photolithography, e-beam lithography or soft lithography (nanoimprinting), which are either expensive, have low-throughput or are sensitive to defects. Low-cost, high-throughput and low-defect-density techniques are therefore of interest for the fabrication of nanostructures. In this study, we investigate the potential of displacement Talbot lithography for the fabrication of specific structures of interest within plasmonic and metamaterial research fields. We demonstrate that nanodash arrays and `fishnet'-like structures can be fabricated by using a double exposure of two different linear grating phase masks. Feature sizes can be tuned by varying the exposure doses. Such lithography has been used to fabricate metallic `fishnet'-like structures using a lift-off technique. This proof of principle paves the way to a low-cost, high-throughput, defect-free and large-scale technique for the fabrication of structures that could be useful for metamaterial and plasmonic metasurfaces. With the development of deep ultraviolet displacement Talbot lithography, the feature dimensions could be pushed lower and used for the fabrication of optical metamaterials in the visible range.

  20. Print-to-pattern dry film photoresist lithography

    International Nuclear Information System (INIS)

    Garland, Shaun P; Murphy, Terrence M Jr; Pan, Tingrui

    2014-01-01

    Here we present facile microfabrication processes, referred to as print-to-pattern dry film photoresist (DFP) lithography, that utilize the combined advantages of wax printing and DFP to produce micropatterned substrates with high resolution over a large surface area in a non-cleanroom setting. The print-to-pattern methods can be performed in an out-of-cleanroom environment making microfabrication much more accessible to minimally equipped laboratories. Two different approaches employing either wax photomasks or wax etchmasks from a solid ink desktop printer have been demonstrated that allow the DFP to be processed in a negative tone or positive tone fashion, respectively, with resolutions of 100 µm. The effect of wax melting on resolution and as a bonding material was also characterized. In addition, solid ink printers have the capacity to pattern large areas with high resolution, which was demonstrated by stacking DFP layers in a 50 mm × 50 mm woven pattern with 1 mm features. By using an office printer to generate the masking patterns, the mask designs can be easily altered in a graphic user interface to enable rapid prototyping. (technical note)

  1. Securing classification and regulatory approval for deepwater projects: management challenges in a global environment

    Energy Technology Data Exchange (ETDEWEB)

    Feijo, Luiz P.; Burton, Gareth C. [American Bureau of Shipping (ABS), Rio de Janeiro, RJ (Brazil)

    2008-07-01

    As the offshore industry continues to develop and move into increasingly deeper waters, technological boundaries are being pushed to new limits. Along with these advances, the design, fabrication and installation of deepwater oil and gas projects has become an increasingly global endeavor. After providing an overview of the history and role of Classification Societies, this paper reviews the challenges of securing classification and regulatory approval in a global environment. Operational, procedural and technological changes which one Classification Society; the American Bureau of Shipping, known as ABS, has implemented to address these challenges are presented. The result of the changes has been a more customized service aiming at faster and more streamlined classification approval process. (author)

  2. Project of RE123 bulk superconductors fabrication in a microgravity environment; Bishojuryokuka chodensotai seizo purojekuto

    Energy Technology Data Exchange (ETDEWEB)

    Sakai, N; Murakami, M [International Superconductivity Technology Center, Tokyo (Japan); Shisa, A [Ishikawajima-Harima Heavy Industries Co., Ltd., Toky o(Japan); Hirata, H [Institute for Unmanned Space Experiment Free Flyer, Tokyo (Japan)

    1999-11-25

    Large single-grain bulk rare earth element (RE)-Ba-Cu-O superconductors can be used for various applications such magnetic bearings, load trapped field magnets. The magnetic field generated by bulk RE-Ba-Cu-O superconductors is proportional to its radius, however, the growth of a large single-grain bulk with good quality is difficult due to contamination from the substrate or the crucible and also due to liquid loss. Such problems can be solved by growing RE-Cu-O bulk in a microgravity environment, where the bulk can be supported by a seed crystal alone during crystal growth. Such experiments will be conducted in the Unmanned Space Experiment Recovery System (USERS) project. In this paper, the experiment plan and the present status of the system development are reported. (author)

  3. Environment, safety and health progress assessment of the Fernald Environmental Management Project (FEMP)

    International Nuclear Information System (INIS)

    1991-11-01

    This report documents the results of the Environment, Safety, and Health (ES ampersand H) Progress Assessment of the Fernald Environmental Management Project (FEMP), Fernald, Ohio, conducted from October 15 through October 25, 1991. The Secretary of Energy directed that small, focused, ES ampersand H Progress Assessments be performed as part of the continuing effort to institutionalize line management accountability and the self-assessment process in the areas of ES ampersand H. The FEMP assessment is the pilot assessment for this new program. The objectives for the FEMP ES ampersand H Progress Assessment were to assess: (1) how the FEMP has progressed since the 1989 Tiger Assessment; (2) how effectively the FEMP has corrected specific deficiencies and associated root causes identified by that team; and (3) whether the current organization, resources, and systems are sufficient to proactively manage ES ampersand H issues

  4. Environment, safety and health progress assessment of the Fernald Environmental Management Project (FEMP)

    Energy Technology Data Exchange (ETDEWEB)

    1991-11-01

    This report documents the results of the Environment, Safety, and Health (ES&H) Progress Assessment of the Fernald Environmental Management Project (FEMP), Fernald, Ohio, conducted from October 15 through October 25, 1991. The Secretary of Energy directed that small, focused, ES&H Progress Assessments be performed as part of the continuing effort to institutionalize line management accountability and the self-assessment process in the areas of ES&H. The FEMP assessment is the pilot assessment for this new program. The objectives for the FEMP ES&H Progress Assessment were to assess: (1) how the FEMP has progressed since the 1989 Tiger Assessment; (2) how effectively the FEMP has corrected specific deficiencies and associated root causes identified by that team; and (3) whether the current organization, resources, and systems are sufficient to proactively manage ES&H issues.

  5. Software-based data path for raster-scanned multi-beam mask lithography

    Science.gov (United States)

    Rajagopalan, Archana; Agarwal, Ankita; Buck, Peter; Geller, Paul; Hamaker, H. Christopher; Rao, Nagswara

    2016-10-01

    According to the 2013 SEMATECH Mask Industry Survey,i roughly half of all photomasks are produced using laser mask pattern generator ("LMPG") lithography. LMPG lithography can be used for all layers at mature technology nodes, and for many non-critical and semi-critical masks at advanced nodes. The extensive use of multi-patterning at the 14-nm node significantly increases the number of critical mask layers, and the transition in wafer lithography from positive tone resist to negative tone resist at the 14-nm design node enables the switch from advanced binary masks back to attenuated phase shifting masks that require second level writes to remove unwanted chrome. LMPG lithography is typically used for second level writes due to its high productivity, absence of charging effects, and versatile non-actinic alignment capability. As multi-patterning use expands from double to triple patterning and beyond, the number of LMPG second level writes increases correspondingly. The desire to reserve the limited capacity of advanced electron beam writers for use when essential is another factor driving the demand for LMPG capacity. The increasing demand for cost-effective productivity has kept most of the laser mask writers ever manufactured running in production, sometimes long past their projected lifespan, and new writers continue to be built based on hardware developed some years ago.ii The data path is a case in point. While state-ofthe- art when first introduced, hardware-based data path systems are difficult to modify or add new features to meet the changing requirements of the market. As data volumes increase, design styles change, and new uses are found for laser writers, it is useful to consider a replacement for this critical subsystem. The availability of low-cost, high-performance, distributed computer systems combined with highly scalable EDA software lends itself well to creating an advanced data path system. EDA software, in routine production today, scales

  6. Introducing an Innovative Project Management Framework for First Year Students – Project Work in a PBL Environment

    DEFF Research Database (Denmark)

    Kofoed, Lise B.; Møller, Michael Labovic

    2010-01-01

    Students at Aalborg University (AAU) in Denmark are educated according to the Aalborg Problem Based Learning (PBL) approach which entails working in groups and completing a project each semester. In accordance with this approach students are offered a course – Co-operation, Learning and Project...... in general acknowledge the benefits of thorough project plans and schedules, they often experience difficulties developing them and abiding by them. These experienced difficulties are caused by lack of motivation and competence within this particular area of project management. This paper describes how a new...

  7. Forest Management and the Evolution of Project Design in Dynamic Wildland Urban Interface Fire Environments

    Science.gov (United States)

    Conway, S.

    2014-12-01

    The Truckee Ranger District on the Tahoe National Forest, in the heart of the Sierra Nevada Mountains, has a rich history of human activities. Native American influences, comstock-era logging, fire suppression, development, and recreation have all shaped the natural environment into what it is today. Like much of our national forests in California, forest conditions that have developed are generally much more homogenous and less resistant to disturbance from fire, insect, and disease than they might have been without the myriad of human influences. However, in order to improve the resiliency of our forests to stand replacing disturbances like high severity fire, while managing for integrated anthropomorphic values, it is imperative that management evolve to meet those dynamic needs. Recent advances in remote sensing and GIS allow land managers more access to forest information and can inform site specific prescriptions to change site specific undesirable conditions. It is ecologically and politically complex, yet our forests deserve that microscope. This particular presentation will focus on how the Truckee Ranger District began this process of incorporating several values, generated from stakeholder collaboration, into one project's goals and how those lessons learned informed their most recent project.

  8. The GLOFOULING Partnerships project and the anti-fouling systems: challenges for Marine Environment Protection

    Directory of Open Access Journals (Sweden)

    Fabián Ramírez Cabrales

    2018-05-01

    Full Text Available Within the framework of the Agenda 2030 for Sustainable Development, the regulation of international maritime transport is a priority to face the challenges on the Protection of the Marine Environment. However, some states present difficulties in complying with international or normative agreements adopted by the International Maritime Organization (IMO. In particular, we revised the Guidelines for the control and management of ships’ biofouling to minimize the transfer of invasive aquatic species and their linkage with the Glofouling Associations project, including the adverse effects of the use of antifouling systems and the biocides that may contain. As preliminary results, we identified the challenges that this global project entails for States, shipbuilders, ship maintenance and cleaning companies, universities, port authorities, repair facilities, dry docks and ship recycling, manufacturers and suppliers of anti-fouling paints and other stakeholders. We concluded that the challenges for the international maritime community are linked to the ability of States and stakeholders to enhance scientific knowledge, develop research capacity and transfer marine technology to mitigate marine biological contamination of ships.

  9. Speciation analysis of radionuclides in the environment. NKS-B speciation project report 2007

    Energy Technology Data Exchange (ETDEWEB)

    Xiaolin Hou (Technical Univ. of Denmark, Risoe National Lab. for Sustainable Energy, Roskilde (Denmark)); Aldahan, A. (Uppsala Univ., Dept. of Earth Science, Uppsala (Sweden)); Possnert, G. (Uppsala Univ., Tandem Lab., Uppsala (Sweden)); Lujaniene, G. (Institute of Physics, Vilnius (Lithuania)); Lehto, J. (Univ. of Helsinki, Dept. of Chemistry, Helsinki (Finland)); Salbu, B. (Norwegian Univ. of Life Sciences (UMB), AAs (Norway))

    2008-07-15

    This report describes the work carried out under the NUK-B project SPECIATION 2007. In 2007, the project partners had two meeting in April and November, organized a NUK seminar on speciation and hot particles. SPECIATION 2007 t mainly focused on two issues on speciation (1) further development of speciation methods for radionuclides, and (2) investigation of speciation of radionuclides in environment. The report summarized the work done in partners labs, which includes: (1) Further development on the speciation of 129I and 127I in water samples; (2) Speciation method for 129I and 127I in air; (3) Dynamic system for fractionation of Pu and Am in soil and sediment; (4) Investigation on Re-absorption of Pu during the fractionation of Pu in soil and sediment; (5) Speciation of 129I in North Sea surface water; (6) Partition of 137Cs and 129I in the Nordic lake sediment, pore-water and lake water; (7) Sequential extraction of Pu in soil, sediment and concrete samples, (8) Pu sorption to Mn and Fe oxides in the geological materials, (10) Investigation of the adsorbed species of lanthanides and actinides on clays surfaces. In addition, two review articles on the speciation of plutonium and iodine in environmental are planned to be submitted to an international journal for publication. (au)

  10. Speciation analysis of radionuclides in the environment. NKS-B speciation project report 2007

    International Nuclear Information System (INIS)

    Hou, Xiaolin; Aldahan, A.; Possnert, G.; Lujaniene, G.; Lehto, J.; Salbu, B.

    2008-07-01

    This report describes the work carried out under the NUK-B project SPECIATION 2007. In 2007, the project partners had two meeting in April and November, organized a NUK seminar on speciation and hot particles. SPECIATION 2007 t mainly focused on two issues on speciation (1) further development of speciation methods for radionuclides, and (2) investigation of speciation of radionuclides in environment. The report summarized the work done in partners labs, which includes: (1) Further development on the speciation of 129I and 127I in water samples; (2) Speciation method for 129I and 127I in air; (3) Dynamic system for fractionation of Pu and Am in soil and sediment; (4) Investigation on Re-absorption of Pu during the fractionation of Pu in soil and sediment; (5) Speciation of 129I in North Sea surface water; (6) Partition of 137Cs and 129I in the Nordic lake sediment, pore-water and lake water; (7) Sequential extraction of Pu in soil, sediment and concrete samples, (8) Pu sorption to Mn and Fe oxides in the geological materials, (10) Investigation of the adsorbed species of lanthanides and actinides on clays surfaces. In addition, two review articles on the speciation of plutonium and iodine in environmental are planned to be submitted to an international journal for publication. (au)

  11. Ecological land classification and terrestrial environment effects assessment for the Port Hope and Port Granby projects

    International Nuclear Information System (INIS)

    Taylor, M.; Wittkugel, U.; Kleb, H.

    2006-01-01

    The Ecological Land Classification system was developed to provide a standardized methodology for describing plant communities and wildlife habitat in southern Ontario. The method employs a hierarchical classification system. It can be applied at different levels of accuracy, i.e., at regional, sub-regional, and local scales with an increasing differentiation of vegetation communities. The standardization of the approach permits a comparison of vegetation communities from different sites and an evaluation of the rarity of these communities within the province. Further, the approach facilitates the monitoring of changes in terrestrial communities with time. These characteristics make Ecological Land Classification mapping a useful tool for environmental assessment such as the ones undertaken for the Port Hope and Port Granby Long-Term Waste Management Projects, which were conducted pursuant to the Canadian Environmental Assessment Act 1992. In the context of the Environmental Assessment for the Port Hope and Port Granby Projects, an Ecological Land Classification study was undertaken to characterize the terrestrial environment at regional, local and site levels. Vegetation patches (polygons) were delineated on the basis of air photo interpretation. The individual polygons were then visited for detailed inventory and classified to the most detailed level; that is to the vegetation type. Plant communities were then compared with those listed in the Ontario Natural Heritage Information Centre database to determine their rarity and to determine where they rank as Valued Ecosystem Components. Ecological Land Classification mapping results were used in the assessment of effects to Valued Ecosystem Components. A spatial analysis of the digitized vegetation maps showed the geographic extent of habitat losses and impairments due to various project works and activities. Landscape rehabilitation strategies and concepts were subsequently developed based on Ecological Land

  12. Weak interfaces for UV cure nanoimprint lithography

    Science.gov (United States)

    Houle, Frances; Fornof, Ann; Simonyi, Eva; Miller, Dolores; Truong, Hoa

    2008-03-01

    Nanoimprint lithography using a photocurable organic resist provides a means of patterning substrates with a spatial resolution in the few nm range. The usefulness of the technique is limited by defect generation during template removal, which involves fracture at the interface between the template and the newly cured polymer. Although it is critical to have the lowest possible interfacial fracture toughness (Gc less than 0.1 Jm-2) to avoid cohesive failure in the polymer, there is little understanding on how to achieve this using reacting low viscosity resist fluids. Studies of debonding of a series of free-radical cured polyhedral silsesquioxane crosslinker formulations containing selected reactive diluents from fluorosilane-coated quartz template materials will be described. At constant diluent fraction the storage modulus of cured resists follows trends in initial reaction rate, not diluent Tg. Adhesion is uncorrelated with both Tg and storage modulus. XPS studies of near-interface compositions indicate that component segregation within the resist fluid on contact with the template, prior to cure, plays a significant role in controlling the fracture process.

  13. Smartphone Sensors for Stone Lithography Authentication

    Directory of Open Access Journals (Sweden)

    Giuseppe Schirripa Spagnolo

    2014-05-01

    Full Text Available Nowadays mobile phones include quality photo and video cameras, access to wireless networks and the internet, GPS assistance and other innovative systems. These facilities open them to innovative uses, other than the classical telephonic communication one. Smartphones are a more sophisticated version of classic mobile phones, which have advanced computing power, memory and connectivity. Because fake lithographs are flooding the art market, in this work, we propose a smartphone as simple, robust and efficient sensor for lithograph authentication. When we buy an artwork object, the seller issues a certificate of authenticity, which contains specific details about the artwork itself. Unscrupulous sellers can duplicate the classic certificates of authenticity, and then use them to “authenticate” non-genuine works of art. In this way, the buyer will have a copy of an original certificate to attest that the “not original artwork” is an original one. A solution for this problem would be to insert a system that links together the certificate and the related specific artwork. To do this it is necessary, for a single artwork, to find unique, unrepeatable, and unchangeable characteristics. In this article we propose an innovative method for the authentication of stone lithographs. We use the color spots distribution captured by means of a smartphone camera as a non-cloneable texture of the specific artworks and an information management system for verifying it in mobility stone lithography.

  14. Evaporative Lithography in Open Microfluidic Channel Networks

    KAUST Repository

    Lone, Saifullah

    2017-02-24

    We demonstrate a direct capillary-driven method based on wetting and evaporation of various suspensions to fabricate regular two-dimensional wires in an open microfluidic channel through continuous deposition of micro- or nanoparticles under evaporative lithography, akin to the coffee-ring effect. The suspension is gently placed in a loading reservoir connected to the main open microchannel groove on a PDMS substrate. Hydrophilic conditions ensure rapid spreading of the suspension from the loading reservoir to fill the entire channel length. Evaporation during the spreading and after the channel is full increases the particle concentration toward the end of the channel. This evaporation-induced convective transport brings particles from the loading reservoir toward the channel end where this flow deposits a continuous multilayered particle structure. The particle deposition front propagates backward over the entire channel length. The final dry deposit of the particles is thereby much thicker than the initial volume fraction of the suspension. The deposition depth is characterized using a 3D imaging profiler, whereas the deposition topography is revealed using a scanning electron microscope. The patterning technology described here is robust and passive and hence operates without an external field. This work may well become a launching pad to construct low-cost and large-scale thin optoelectronic films with variable thicknesses and interspacing distances.

  15. STRUCTURING OF DIAMOND FILMS USING MICROSPHERE LITHOGRAPHY

    Directory of Open Access Journals (Sweden)

    Mária Domonkos

    2014-10-01

    Full Text Available In this study, the structuring of micro- and nanocrystalline diamond thin films is demonstrated. The structuring of the diamond films is performed using the technique of microsphere lithography followed by reactive ion etching. Specifically, this paper presents a four-step fabrication process: diamond deposition (microwave plasma assisted chemical vapor deposition, mask preparation (by the standard Langmuir-Blodgett method, mask modification and diamond etching. A self-assembled monolayer of monodisperse polystyrene (PS microspheres with close-packed ordering is used as the primary template. Then the PS microspheres and the diamond films are processed in capacitively coupled radiofrequency plasma  using different plasma chemistries. This fabrication method illustrates the preparation of large arrays of periodic and homogeneous hillock-like structures. The surface morphology of processed diamond films is characterized by scanning electron microscopy and atomic force microscope. The potential applications of such diamond structures in various fields of nanotechnology are also briefly discussed.

  16. Nanosphere lithography applied to magnetic thin films

    Science.gov (United States)

    Gleason, Russell

    Magnetic nanostructures have widespread applications in many areas of physics and engineering, and nanosphere lithography has recently emerged as promising tool for the fabrication of such nanostructures. The goal of this research is to explore the magnetic properties of a thin film of ferromagnetic material deposited onto a hexagonally close-packed monolayer array of polystyrene nanospheres, and how they differ from the magnetic properties of a typical flat thin film. The first portion of this research focuses on determining the optimum conditions for depositing a monolayer of nanospheres onto chemically pretreated silicon substrates (via drop-coating) and the subsequent characterization of the deposited nanosphere layer with scanning electron microscopy. Single layers of permalloy (Ni80Fe20) are then deposited on top of the nanosphere array via DC magnetron sputtering, resulting in a thin film array of magnetic nanocaps. The coercivities of the thin films are measured using a home-built magneto-optical Kerr effect (MOKE) system in longitudinal arrangement. MOKE measurements show that for a single layer of permalloy (Py), the coercivity of a thin film deposited onto an array of nanospheres increases compared to that of a flat thin film. In addition, the coercivity increases as the nanosphere size decreases for the same deposited layer. It is postulated that magnetic exchange decoupling between neighboring nanocaps suppresses the propagation of magnetic domain walls, and this pinning of the domain walls is thought to be the primary source of the increase in coercivity.

  17. Reflective masks for extreme ultraviolet lithography

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Khanh Bao [Univ. of California, Berkeley, CA (United States)

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 μm wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  18. Environment

    DEFF Research Database (Denmark)

    Valentini, Chiara

    2017-01-01

    The term environment refers to the internal and external context in which organizations operate. For some scholars, environment is defined as an arrangement of political, economic, social and cultural factors existing in a given context that have an impact on organizational processes and structures....... For others, environment is a generic term describing a large variety of stakeholders and how these interact and act upon organizations. Organizations and their environment are mutually interdependent and organizational communications are highly affected by the environment. This entry examines the origin...... and development of organization-environment interdependence, the nature of the concept of environment and its relevance for communication scholarships and activities....

  19. Hazardous materials in aquatic environments of the Mississippi River Basin. Quarterly project status report, October 1, 1993--December 31, 1993

    Energy Technology Data Exchange (ETDEWEB)

    1993-12-31

    This quarterly project status report discusses research projects being conducted on hazardous materials in aquatic environments of the Mississippi River basin. We continued to seek improvement in our methods of communication and interactions to support the inter-disciplinary, inter-university collaborators within this program. In addition to the defined collaborative research teams, there is increasing interaction among investigators across projects. Planning for the second year of the project has included the development of our internal request for proposals, and refining the review process for selection of proposals for funding.

  20. Recommendations for Guidelines for Environment-Specific Magnetic-Field Measurements, Rapid Program Engineering Project #2

    Energy Technology Data Exchange (ETDEWEB)

    Electric Research and Management, Inc.; IIT Research Institute; Magnetic Measurements; Survey Research Center, University of California; T. Dan Bracken, Inc.

    1997-03-11

    The purpose of this project was to document widely applicable methods for characterizing the magnetic fields in a given environment, recognizing the many sources co-existing within that space. The guidelines are designed to allow the reader to follow an efficient process to (1) plan the goals and requirements of a magnetic-field study, (2) develop a study structure and protocol, and (3) document and carry out the plan. These guidelines take the reader first through the process of developing a basic study strategy, then through planning and performing the data collection. Last, the critical factors of data management, analysis reporting, and quality assurance are discussed. The guidelines are structured to allow the researcher to develop a protocol that responds to specific site and project needs. The Research and Public Information Dissemination Program (RAPID) is based on exposure to magnetic fields and the potential health effects. Therefore, the most important focus for these magnetic-field measurement guidelines is relevance to exposure. The assumed objective of an environment-specific measurement is to characterize the environment (given a set of occupants and magnetic-field sources) so that information about the exposure of the occupants may be inferred. Ideally, the researcher seeks to obtain complete or "perfect" information about these magnetic fields, so that personal exposure might also be modeled perfectly. However, complete data collection is not feasible. In fact, it has been made more difficult as the research field has moved to expand the list of field parameters measured, increasing the cost and complexity of performing a measurement and analyzing the data. The guidelines address this issue by guiding the user to design a measurement protocol that will gather the most exposure-relevant information based on the locations of people in relation to the sources. We suggest that the "microenvironment" become the base unit of area in a study, with

  1. Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

    Directory of Open Access Journals (Sweden)

    Manuel R. Gonçalves

    2011-08-01

    Full Text Available We present two routes for the fabrication of plasmonic structures based on nanosphere lithography templates. One route makes use of soft-lithography to obtain arrays of epoxy resin hemispheres, which, in a second step, can be coated by metal films. The second uses the hexagonal array of triangular structures, obtained by evaporation of a metal film on top of colloidal crystals, as a mask for reactive ion etching (RIE of the substrate. In this way, the triangular patterns of the mask are transferred to the substrate through etched triangular pillars. Making an epoxy resin cast of the pillars, coated with metal films, allows us to invert the structure and obtain arrays of triangular holes within the metal. Both fabrication methods illustrate the preparation of large arrays of nanocavities within metal films at low cost.Gold films of different thicknesses were evaporated on top of hemispherical structures of epoxy resin with different radii, and the reflectance and transmittance were measured for optical wavelengths. Experimental results show that the reflectivity of coated hemispheres is lower than that of coated polystyrene spheres of the same size, for certain wavelength bands. The spectral position of these bands correlates with the size of the hemispheres. In contrast, etched structures on quartz coated with gold films exhibit low reflectance and transmittance values for all wavelengths measured. Low transmittance and reflectance indicate high absorbance, which can be utilized in experiments requiring light confinement.

  2. Providing more informative projections of climate change impact on plant distribution in a mountain environment

    Science.gov (United States)

    Randin, C.; Engler, R.; Pearman, P.; Vittoz, P.; Guisan, A.

    2007-12-01

    Due to their conic shape and the reduction of area with increasing elevation, mountain ecosystems were early identified as potentially very sensitive to global warming. Moreover, mountain systems may experience unprecedented rates of warming during the next century, two or three times higher than that records of the 20th century. In this context, species distribution models (SDM) have become important tools for rapid assessment of the impact of accelerated land use and climate change on the distribution plant species. In this study, we developed and tested new predictor variables for species distribution models (SDM), specific to current and future geographic projections of plant species in a mountain system, using the Western Swiss Alps as model region. Since meso- and micro-topography are relevant to explain geographic patterns of plant species in mountain environments, we assessed the effect of scale on predictor variables and geographic projections of SDM. We also developed a methodological framework of space-for-time evaluation to test the robustness of SDM when projected in a future changing climate. Finally, we used a cellular automaton to run dynamic simulations of plant migration under climate change in a mountain landscape, including realistic distance of seed dispersal. Results of future projections for the 21st century were also discussed in perspective of vegetation changes monitored during the 20th century. Overall, we showed in this study that, based on the most severe A1 climate change scenario and realistic dispersal simulations of plant dispersal, species extinctions in the Western Swiss Alps could affect nearly one third (28.5%) of the 284 species modeled by 2100. With the less severe B1 scenario, only 4.6% of species are predicted to become extinct. However, even with B1, 54% (153 species) may still loose more than 80% of their initial surface. Results of monitoring of past vegetation changes suggested that plant species can react quickly to the

  3. Project Lifespan-based Nonstationary Hydrologic Design Methods for Changing Environment

    Science.gov (United States)

    Xiong, L.

    2017-12-01

    Under changing environment, we must associate design floods with the design life period of projects to ensure the hydrologic design is really relevant to the operation of the hydrologic projects, because the design value for a given exceedance probability over the project life period would be significantly different from that over other time periods of the same length due to the nonstationarity of probability distributions. Several hydrologic design methods that take the design life period of projects into account have been proposed in recent years, i.e. the expected number of exceedances (ENE), design life level (DLL), equivalent reliability (ER), and average design life level (ADLL). Among the four methods to be compared, both the ENE and ER methods are return period-based methods, while DLL and ADLL are risk/reliability- based methods which estimate design values for given probability values of risk or reliability. However, the four methods can be unified together under a general framework through a relationship transforming the so-called representative reliability (RRE) into the return period, i.e. m=1/1(1-RRE), in which we compute the return period m using the representative reliability RRE.The results of nonstationary design quantiles and associated confidence intervals calculated by ENE, ER and ADLL were very similar, since ENE or ER was a special case or had a similar expression form with respect to ADLL. In particular, the design quantiles calculated by ENE and ADLL were the same when return period was equal to the length of the design life. In addition, DLL can yield similar design values if the relationship between DLL and ER/ADLL return periods is considered. Furthermore, ENE, ER and ADLL had good adaptability to either an increasing or decreasing situation, yielding not too large or too small design quantiles. This is important for applications of nonstationary hydrologic design methods in actual practice because of the concern of choosing the emerging

  4. Fabrication of a Polymer Micro Needle Array by Mask-Dragging X-Ray Lithography and Alignment X-Ray Lithography

    International Nuclear Information System (INIS)

    Li Yi-Gui; Yang Chun-Sheng; Liu Jing-Quan; Sugiyama Susumu

    2011-01-01

    Polymer materials such as transparent thermoplastic poly(methyl methacrylate) (PMMA) have been of great interest in the research and development of integrated circuits and micro-electromechanical systems due to their relatively low cost and easy process. We fabricated PMMA-based polymer hollow microneedle arrays by mask-dragging and aligning x-ray lithography. Techniques for 3D micromachining by direct lithography using x-rays are developed. These techniques are based on using image projection in which the x-ray is used to illuminate an appropriate gold pattern on a polyimide film mask. The mask is imaged onto the PMMA sample. A pattern with an area of up to 100 × 100mm 2 can be fabricated with sub-micron resolution and a highly accurate order of a few microns by using a dragging mask. The fabrication technology has several advantages, such as forming complex 3D micro structures, high throughput and low cost. (cross-disciplinary physics and related areas of science and technology)

  5. Clinical Digital Libraries Project: design approach and exploratory assessment of timely use in clinical environments.

    Science.gov (United States)

    Maccall, Steven L

    2006-04-01

    The paper describes and evaluates the use of Clinical Digital Libraries Project (CDLP) digital library collections in terms of their facilitation of timely clinical information seeking. A convenience sample of CDLP Web server log activity over a twelve-month period (7/2002 to 6/2003) was analyzed for evidence of timely information seeking after users were referred to digital library clinical topic pages from Web search engines. Sample searches were limited to those originating from medical schools (26% North American and 19% non-North American) and from hospitals or clinics (51% North American and 4% non-North American). Timeliness was determined based on a calculation of the difference between the timestamps of the first and last Web server log "hit" during each search in the sample. The calculated differences were mapped into one of three ranges: less than one minute, one to three minutes, and three to five minutes. Of the 864 searches analyzed, 48% were less than 1 minute, 41% were 1 to 3 minutes, and 11% were 3 to 5 minutes. These results were further analyzed by environment (medical schools versus hospitals or clinics) and by geographic location (North America versus non-North American). Searches reflected a consistent pattern of less than 1 minute in these environments. Though the results were not consistent on a month-by-month basis over the entire time period, data for 8 of 12 months showed that searches shorter than 1 minute predominated and data for 1 month showed an equal number of less than 1 minute and 1 to 3 minute searches. The CDLP digital library collections provided timely access to high-quality Web clinical resources when used for information seeking in medical education and hospital or clinic environments from North American and non-North American locations and consistently provided access to the sought information within the documented two-minute standard. The limitations of the use of Web server data warrant an exploratory assessment. This

  6. Clinical Digital Libraries Project: design approach and exploratory assessment of timely use in clinical environments*

    Science.gov (United States)

    MacCall, Steven L.

    2006-01-01

    Objective: The paper describes and evaluates the use of Clinical Digital Libraries Project (CDLP) digital library collections in terms of their facilitation of timely clinical information seeking. Design: A convenience sample of CDLP Web server log activity over a twelve-month period (7/2002 to 6/2003) was analyzed for evidence of timely information seeking after users were referred to digital library clinical topic pages from Web search engines. Sample searches were limited to those originating from medical schools (26% North American and 19% non-North American) and from hospitals or clinics (51% North American and 4% non-North American). Measurement: Timeliness was determined based on a calculation of the difference between the timestamps of the first and last Web server log “hit” during each search in the sample. The calculated differences were mapped into one of three ranges: less than one minute, one to three minutes, and three to five minutes. Results: Of the 864 searches analyzed, 48% were less than 1 minute, 41% were 1 to 3 minutes, and 11% were 3 to 5 minutes. These results were further analyzed by environment (medical schools versus hospitals or clinics) and by geographic location (North America versus non-North American). Searches reflected a consistent pattern of less than 1 minute in these environments. Though the results were not consistent on a month-by-month basis over the entire time period, data for 8 of 12 months showed that searches shorter than 1 minute predominated and data for 1 month showed an equal number of less than 1 minute and 1 to 3 minute searches. Conclusions: The CDLP digital library collections provided timely access to high-quality Web clinical resources when used for information seeking in medical education and hospital or clinic environments from North American and non–North American locations and consistently provided access to the sought information within the documented two-minute standard. The limitations of the use of

  7. The analysis of MS Project Server platform for managing of human resources in multiproject environment

    OpenAIRE

    Kadunc, Boštjan

    2009-01-01

    Effective project management requires qualified project managers, who must have complete control over their projects, so they can perform fluently. For easier and more effective project management, we can use various software solutions. In my graduation thesis I focused on working with resources - detecting and resolving their over-allocation. For their regulation I have used Microsoft Office Project Professional 2007 in connection with Microsoft Office Project Server 2007. My goal wa...

  8. A Summary of the NASA Design Environment for Novel Vertical Lift Vehicles (DELIVER) Project

    Science.gov (United States)

    Theodore, Colin R.

    2018-01-01

    The number of new markets and use cases being developed for vertical take-off and landing vehicles continues to explode, including the highly publicized urban air taxi and package deliver applications. There is an equally exploding variety of novel vehicle configurations and sizes that are being proposed to fill these new market applications. The challenge for vehicle designers is that there is currently no easy and consistent way to go from a compelling mission or use case to a vehicle that is best configured and sized for the particular mission. This is because the availability of accurate and validated conceptual design tools for these novel types and sizes of vehicles have not kept pace with the new markets and vehicles themselves. The Design Environment for Novel Vertical Lift Vehicles (DELIVER) project was formulated to address this vehicle design challenge by demonstrating the use of current conceptual design tools, that have been used for decades to design and size conventional rotorcraft, applied to these novel vehicle types, configurations and sizes. In addition to demonstrating the applicability of current design and sizing tools to novel vehicle configurations and sizes, DELIVER also demonstrated the addition of key transformational technologies of noise, autonomy, and hybrid-electric and all-electric propulsion into the vehicle conceptual design process. Noise is key for community acceptance, autonomy and the need to operate autonomously are key for efficient, reliable and safe operations, and electrification of the propulsion system is a key enabler for these new vehicle types and sizes. This paper provides a summary of the DELIVER project and shows the applicability of current conceptual design and sizing tools novel vehicle configurations and sizes that are being proposed for urban air taxi and package delivery type applications.

  9. Speciation analysis of radionuclides in the environment - NSK-B SPECIATION project report 2009

    International Nuclear Information System (INIS)

    Hou, X.; Aldahan, A.; Possnert, G.; Lujaniene, G.; Lehto, J.; Skipperud, L.; Lind, O.C.; Salbu, B.

    2009-10-01

    The second stage of the NKS-B project SPECIATION was complemented in 2008-2009, which mainly focus on three aspects: (1) Further improvement and development of methods for speciation analysis of radionuclides; (2) Investigation of speciation of some radionuclides in the environment (water, sediments, particles); and (3) Intercomparison excise for speciation analysis of radionuclides in soil and sediment. This report summarizes the work completed in the project partners' laboratories. Method developments include: Development of an rapid and in-suit separation method for the speciation analysis of 129I in seawater samples; Development of a simple method for the speciation analysis of 129I in fresh water and seawater samples; Development of an on-line HPLC-ICP-MS method for the direct speciation analysis of 127I in water and leachate samples; Speciation of radionuclides in water includes: Speciation of 129I and 127I in time-series precipitation samples collected in Denmark 2001-2006 and its application for the investigation of geochemistry and atmospheric chemistry of iodine, Speciation of radionuclides in Ob and Yenisey Rivers, and Speciation of 129I and 127I in Lake Heimdalen water. Speciation of radionuclides in soils and sediments includes: Sequential extraction of radionuclides in sediments and of trace elements in soil samples. Sequential extraction of radionuclides in aerosols and particles has also been performed. Furthermore, sorption experiments have been performed to investigate the association of Pu, Am and Cs with different geological materials. The intercomparison exercises included sequential extraction of Pu, 137Cs, U, Th, and 129I in one soil and one sediment standard reference materials (NIST-4354, IAEA-375) and Pu in sediment collected from the Lake Heimdalen, Norway. (author)

  10. Speciation analysis of radionuclides in the environment - NSK-B SPECIATION project report 2009

    Energy Technology Data Exchange (ETDEWEB)

    Hou, X. (Technical Univ. of Denmark, Risoe National Lab. for Sustainable Energy, Roskilde (Denmark)); Aldahan, A. (Uppsala Univ., Dept. of Earth Science (Sweden)); Possnert, G. (Uppsala Univ., Tandem Lab. (Sweden)); Lujaniene, G. (Univ. of Helsinki, Lab. of Radiochemistry (Finland)); Lehto, J. (Institute of Physics (Lithuania)); Skipperud, L.; Lind, O.C.; Salbu, B. (Norwegian Univ. of Life Sciences, Isotope Lab., AAs (Norway))

    2009-10-15

    The second stage of the NKS-B project SPECIATION was complemented in 2008-2009, which mainly focus on three aspects: (1) Further improvement and development of methods for speciation analysis of radionuclides; (2) Investigation of speciation of some radionuclides in the environment (water, sediments, particles); and (3) Intercomparison excise for speciation analysis of radionuclides in soil and sediment. This report summarizes the work completed in the project partners' laboratories. Method developments include: Development of an rapid and in-suit separation method for the speciation analysis of 129I in seawater samples; Development of a simple method for the speciation analysis of 129I in fresh water and seawater samples; Development of an on-line HPLC-ICP-MS method for the direct speciation analysis of 127I in water and leachate samples; Speciation of radionuclides in water includes: Speciation of 129I and 127I in time-series precipitation samples collected in Denmark 2001-2006 and its application for the investigation of geochemistry and atmospheric chemistry of iodine, Speciation of radionuclides in Ob and Yenisey Rivers, and Speciation of 129I and 127I in Lake Heimdalen water. Speciation of radionuclides in soils and sediments includes: Sequential extraction of radionuclides in sediments and of trace elements in soil samples. Sequential extraction of radionuclides in aerosols and particles has also been performed. Furthermore, sorption experiments have been performed to investigate the association of Pu, Am and Cs with different geological materials. The intercomparison exercises included sequential extraction of Pu, 137Cs, U, Th, and 129I in one soil and one sediment standard reference materials (NIST-4354, IAEA-375) and Pu in sediment collected from the Lake Heimdalen, Norway. (author)

  11. The Student-Centered Active Learning Environment for Undergraduate Programs (SCALE-UP) Project

    Science.gov (United States)

    Beichner, Robert J.

    2011-04-01

    How do you keep a classroom of 100 undergraduates actively learning? Can students practice communication and teamwork skills in a large class? How do you boost the performance of underrepresented groups? The Student-Centered Active Learning Environment for Undergraduate Programs (SCALE-UP) Project has addressed these concerns. Because of their inclusion in a leading introductory physics textbook, project materials are used by more than 1/3 of all science, math, and engineering majors nationwide. The room design and pedagogy have been adopted at more than 100 leading institutions across the country. Physics, chemistry, math, astronomy, biology, engineering, earth sciences, and even literature classes are currently being taught this way. Educational research indicates that students should collaborate on interesting tasks and be deeply involved with the material they are studying. We promote active learning in a redesigned classroom for 100 students or more. (Of course, smaller classes can also benefit.) Class time is spent primarily on "tangibles" and "ponderables"--hands-on activities, simulations, and interesting questions. Nine students sit in three teams at round tables. Instructors circulate and engage in Socratic dialogues. The setting looks like a banquet hall, with lively interactions nearly all the time. Hundreds of hours of classroom video and audio recordings, transcripts of numerous interviews and focus groups, data from conceptual learning assessments (using widely-recognized instruments in a pretest/posttest protocol), and collected portfolios of student work are part of our rigorous assessment effort. Our findings (based on data from over 16,000 students collected over five years as well as replications at adopting sites) can be summarized as the following: 1) Female failure rate is 1/5 of previous levels, even though more is demanded of students. 2) Minority failure rate is 1/4 that seen in traditionally taught courses. 3) At-risk students are more

  12. SERVICES OF FULL-TEXT SEARCHING IN A DISTRIBUTED INFORMATION ENVIRONMENT (PROJECT HUMANITARIANA

    Directory of Open Access Journals (Sweden)

    S. K. Lyapin

    2015-01-01

    Full Text Available Problem statement. We justify the possibility of full-text search services application in both universal and specialized (in terms of resource base digital libraries for the extraction and analysis of the context knowledge in the humanities. The architecture and services of virtual information and resource center for extracting knowledge from the humanitarian texts generated by «Humanitariana» project are described. The functional integration of the resources and services for a full-text search in a distributed decentralized environment, organized in the Internet / Intranet architecture under the control of the client (user browser accessing a variety of independent servers. An algorithm for a distributed full-text query implementation is described. Methods. Method of combining requency-ranked and paragraph-oriented full-text queries is used: the first are used for the preliminary analysis of the subject area or a combination product (explication of "vertical" context, or macro context, the second - for the explication of "horizontal" context, or micro context within copyright paragraph. The results of the frequency-ranked queries are used to compile paragraph-oriented queries. Results. The results of textual research are shown on the topics "The question of fact in Russian philosophy", "The question of loneliness in Russian philosophy and culture". About 50 pieces of context knowledge on the total resource base of about 2,500 full-text resources have been explicated and briefly described to their further expert investigating. Practical significance. The proposed technology (advanced full-text searching services in a distributed information environment can be used for the information support of humanitarian studies and education in the humanities, for functional integration of resources and services of various organizations, for carrying out interdisciplinary research.

  13. Contributions of Pakistan in the IAEA/RCA/UNDP regional project on management of marine coastal environment and its pollution

    International Nuclear Information System (INIS)

    Qureshi, R.M.; Mashiatullah, A.; Fazil, M.; Ahmad, E.; Tasneem, M.A.; Khan, H.A.; Sajjad, M.I.

    2002-01-01

    The International Atomic Energy Agency (IAEA), Vienna, launched a five years (duration: 1998 - 2002) Joint Project on 'Better Management of the Environment and Industrial Growth Through Isotope and Radiation Technology (RAS/97/030)' in co-operation with the RCA (Regional Co-operative Agreement) office, Vienna, and United Nations Development Programme (UNDP). The Marine Sub-project entitled 'Management of Marine Coastal Environment and its Pollution (RAS/8/083)' is 'Output 1.2' of this joint project. Pakistan is very actively participating in activities of the IAEA/RCA/UNDP Marine Sub-Project that were planned in two Project Formulation Meetings (PFMs) held at Manila, Philippines, during 1998. In Pakistan, various activities of the national marine pollution project are being administered by the nuclear institute namely, Pakistan Institute of Nuclear Science and Technology (PINSTECH), in collaboration with national end user institutions. To-date, Pakistan has significantly contributed in this project, both at national level and at RCA regional level. This paper highlights the progress and some accomplishments of Pakistan, up to the year 2001, for marine pollution studies related to the IAEA/RCA regional marine sub project. (author)

  14. Fabrication of Monolithic Bridge Structures by Vacuum-Assisted Capillary-Force Lithography

    KAUST Repository

    Kwak, Rhokyun; Jeong, Hoon Eui; Suh, Kahp Y.

    2009-01-01

    Monolithic bridge structures were fabricated by using capillary-force lithography (CFL), which was developed for patterning polymers over a large area by combining essential features of nanoimprint lithography and capillarity. A patterned soft mold

  15. The Costa Rica GLOBE (Global Learning and Observations to Benefit the Environment) Project as a Learning Science Environment

    Science.gov (United States)

    Castro Rojas, María Dolores; Zuñiga, Ana Lourdes Acuña; Ugalde, Emmanuel Fonseca

    2015-01-01

    GLOBE is a global educational program for elementary and high school levels, and its main purpose in Costa Rica is to develop scientific thinking and interest for science in high school students through hydrology research projects that allow them to relate science with environmental issues in their communities. Youth between 12 and 17 years old…

  16. Optical characterisation of photonic wire and photonic crystal waveguides fabricated using nanoimprint lithography

    DEFF Research Database (Denmark)

    Borel, Peter Ingo; Frandsen, Lars Hagedorn; Lavrinenko, Andrei

    2006-01-01

    We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography.......We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography....

  17. Development of Blue Laser Direct-Write Lithography System

    Directory of Open Access Journals (Sweden)

    Hao-Wen Chang

    2012-01-01

    Full Text Available The optical lithography system researched in this study adopted the laser direct-write lithography technology with nano-positioning stage by using retailing blue ray optical pickup head contained 405nm wavelength and 0.85 numerical aperture of focus lens as the system lighting source. The system employed a photodiode received the focusing error signal reflected by the glass substrate to identify specimen position and automatic focused control with voice coil motor. The pattern substrate was loaded on a nano-positioning stage; input pattern path automatically and collocate with inner program at the same time. This research has successfully developed a blue laser lithography process system. The single spot size can be narrowed down to 3.07 μm and the linewidth is 3.3μm, time of laser control can reach to 450 ns and the exposure pattern can be controlled by program as well.

  18. Graphene nanoribbon superlattices fabricated via He ion lithography

    International Nuclear Information System (INIS)

    Archanjo, Braulio S.; Fragneaud, Benjamin; Gustavo Cançado, Luiz; Winston, Donald; Miao, Feng; Alberto Achete, Carlos; Medeiros-Ribeiro, Gilberto

    2014-01-01

    Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel “defect” lines of ∼1 μm length and ≈5 nm width were written to form nanoribbon gratings down to 20 nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ∼ 2× smaller than do Ga ions, demonstrating that scanning-He + -beam lithography can texture graphene with less damage

  19. Graphene nanoribbon superlattices fabricated via He ion lithography

    Energy Technology Data Exchange (ETDEWEB)

    Archanjo, Braulio S., E-mail: bsarchanjo@inmetro.gov.br [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Fragneaud, Benjamin [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Física, Universidade Federal de Juiz de Fora, Juiz de Fora, MG 36036-330 (Brazil); Gustavo Cançado, Luiz [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Física, Universidade Federal de Minas Gerais, Belo Horizonte, MG 30123-970 (Brazil); Winston, Donald [Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States); Miao, Feng [Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States); National Laboratory of Solid State Microstructures, School of Physics, National Center of Microstructures and Quantum Manipulation, Nanjing University, Nanjing 210093 (China); Alberto Achete, Carlos [Divisão de Metrologia de Materiais, Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMETRO), Duque de Caxias, RJ 25250-020 (Brazil); Departamento de Engenharia Metalúrgica e de Materiais, Universidade Federal do Rio de janeiro, Rio de Janeiro RJ 21941-972 (Brazil); Medeiros-Ribeiro, Gilberto [Departamento de Física, Universidade Federal de Minas Gerais, Belo Horizonte, MG 30123-970 (Brazil); Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304 (United States)

    2014-05-12

    Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel “defect” lines of ∼1 μm length and ≈5 nm width were written to form nanoribbon gratings down to 20 nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ∼ 2× smaller than do Ga ions, demonstrating that scanning-He{sup +}-beam lithography can texture graphene with less damage.

  20. The application of synchrotron radiation to X-ray lithography

    International Nuclear Information System (INIS)

    Spiller, E.; Eastman, D.E.; Feder, R.; Grobman, W.D.; Gudat, W.; Topalian, J.

    1976-06-01

    Synchrotron radiation from the German electron synchrotron DESY in Hamburg has been used for X-ray lithograpgy. Replications of different master patterns (for magnetic bubble devices, fresnel zone plates, etc.) were made using various wavelengths and exposures. High quality lines down to 500 A wide have been reproduced using very soft X-rays. The sensitivities of X-ray resists have been evaluated over a wide range of exposures. Various critical factors (heating, radiation damage, etc.) involved with X-ray lithography using synchrotron radiation have been studied. General considerations of storage ring sources designed as radiation sources for X-ray lithography are discussed, together with a comparison with X-ray tube sources. The general conclusion is that X-ray lithography using synchrotron radiation offers considerable promise as a process for forming high quality sub-micron images with exposure times as short as a few seconds. (orig.) [de

  1. Aviation Trends Related to Atmospheric Environment Safety Technologies Project Technical Challenges

    Science.gov (United States)

    Reveley, Mary S.; Withrow, Colleen A.; Barr, Lawrence C.; Evans, Joni K.; Leone, Karen M.; Jones, Sharon M.

    2014-01-01

    Current and future aviation safety trends related to the National Aeronautics and Space Administration's Atmospheric Environment Safety Technologies Project's three technical challenges (engine icing characterization and simulation capability; airframe icing simulation and engineering tool capability; and atmospheric hazard sensing and mitigation technology capability) were assessed by examining the National Transportation Safety Board (NTSB) accident database (1989 to 2008), incidents from the Federal Aviation Administration (FAA) accident/incident database (1989 to 2006), and literature from various industry and government sources. The accident and incident data were examined for events involving fixed-wing airplanes operating under Federal Aviation Regulation (FAR) Parts 121, 135, and 91 for atmospheric conditions related to airframe icing, ice-crystal engine icing, turbulence, clear air turbulence, wake vortex, lightning, and low visibility (fog, low ceiling, clouds, precipitation, and low lighting). Five future aviation safety risk areas associated with the three AEST technical challenges were identified after an exhaustive survey of a variety of sources and include: approach and landing accident reduction, icing/ice detection, loss of control in flight, super density operations, and runway safety.

  2. All-dry resist processes for 193-nm lithography

    Science.gov (United States)

    Horn, Mark W.; Maxwell, Brian E.; Kunz, Roderick R.; Hibbs, Michael S.; Eriksen, Lynn M.; Palmateer, Susan C.; Forte, Anthony R.

    1995-06-01

    We report on two different all-dry resist schemes for 193-nm lithography, one negative tone and one positive tone. Our negative tone resist is an extension of our initial work on all-dry photoresists. This scheme employs a bilayer in which the imaging layer is formed by plasma enhanced chemical vapor deposition (PECVD) from tetramethylsilane (TMS) and deposited onto PECVD carbon-based planarizing layers. Figure 1 shows SEMs of dark field and light field octagons patterned in projection on Lincoln Laboratory's 0.5-NA 193-nm Micrascan system. These 0.225-micrometers and 0.200-micrometers line and space features were obtained at a dose of approximately 58 mJ/cm2. Dry development of the exposed resist was accomplished using Cl2 chemistry in a helicon high-ion-density etching tool. Pattern transfer was performed in the helicon tool with oxygen-based chemistries. Recently, we have also developed an all-dry positive-tone silylation photoresist. This photoresist is a PECVD carbon-based polymer which is crosslinked by 193-nm exposure, enabling selective silylation similar to that initially reported by Hartney et al., with spin-applied polymers. In those polymers, for example polyvinylphenol, the silylation site concentration is fixed by the hydroxyl groups on the polymer precursors, thus limiting the silicon uptake per unit volume. With PECVD polymers, the total concentration of silylation sites and their depth can be tailored by varying plasma species as a function of time during the deposition. This affords the possibility of greater silicon uptake per unit volume and better depth control of the silylation profile. Figure 2 shows a SEM of 0.5-micrometers features patterned in plasma deposited silylation resist.

  3. Low-defect reflective mask blanks for extreme ultraviolet lithography

    International Nuclear Information System (INIS)

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Ray-Chaudhuri, A; Walton, C.

    1999-01-01

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA road map well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm ampersand sup2; at sign 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm ampersand sup2; for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm ampersand sup2; in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10 -2 /cm ampersand sup2; level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling

  4. Lithography for enabling advances in integrated circuits and devices.

    Science.gov (United States)

    Garner, C Michael

    2012-08-28

    Because the transistor was fabricated in volume, lithography has enabled the increase in density of devices and integrated circuits. With the invention of the integrated circuit, lithography enabled the integration of higher densities of field-effect transistors through evolutionary applications of optical lithography. In 1994, the semiconductor industry determined that continuing the increase in density transistors was increasingly difficult and required coordinated development of lithography and process capabilities. It established the US National Technology Roadmap for Semiconductors and this was expanded in 1999 to the International Technology Roadmap for Semiconductors to align multiple industries to provide the complex capabilities to continue increasing the density of integrated circuits to nanometre scales. Since the 1960s, lithography has become increasingly complex with the evolution from contact printers, to steppers, pattern reduction technology at i-line, 248 nm and 193 nm wavelengths, which required dramatic improvements of mask-making technology, photolithography printing and alignment capabilities and photoresist capabilities. At the same time, pattern transfer has evolved from wet etching of features, to plasma etch and more complex etching capabilities to fabricate features that are currently 32 nm in high-volume production. To continue increasing the density of devices and interconnects, new pattern transfer technologies will be needed with options for the future including extreme ultraviolet lithography, imprint technology and directed self-assembly. While complementary metal oxide semiconductors will continue to be extended for many years, these advanced pattern transfer technologies may enable development of novel memory and logic technologies based on different physical phenomena in the future to enhance and extend information processing.

  5. Functionalized SU-8 patterned with X-ray Lithography

    DEFF Research Database (Denmark)

    Balslev, Søren; Romanato, F.

    2005-01-01

    spontaneous emission light source that couples out light normal to the chip plane. In addition we examine the influence of the x-ray irradiation on the fluorescence of thin films of dye doped SU-8. The dye embedded in the SU-8 is optically excited during, characterization by an external light source tuned......In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified...

  6. Inventory of Federal energy-related environment and safety research for FY 1979. Volume II. Project listings and indexes

    Energy Technology Data Exchange (ETDEWEB)

    None

    1980-12-01

    This volume contains summaries of FY 1979 government-sponsored environment and safety research related to energy arranged by log number, which groups the projects by reporting agency. The log number is a unique number assigned to each project from a block of numbers set aside for each contributing agency. Information elements included in the summary listings are project title, principal investigators, research organization, project number, contract number, supporting organization, funding level, related energy sources with numbers indicating percentages of effort devoted to each, and R and D categories. A brief description of each project is given, and this is followed by subject index terms that were assigned for computer searching and for generating the printed subject index in the back of this volume.

  7. Inventory of Federal energy-related environment and safety research for FY 1979. Volume II. Project listings and indexes

    International Nuclear Information System (INIS)

    1980-12-01

    This volume contains summaries of FY 1979 government-sponsored environment and safety research related to energy arranged by log number, which groups the projects by reporting agency. The log number is a unique number assigned to each project from a block of numbers set aside for each contributing agency. Information elements included in the summary listings are project title, principal investigators, research organization, project number, contract number, supporting organization, funding level, related energy sources with numbers indicating percentages of effort devoted to each, and R and D categories. A brief description of each project is given, and this is followed by subject index terms that were assigned for computer searching and for generating the printed subject index in the back of this volume

  8. Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography

    International Nuclear Information System (INIS)

    Altun, Ali Ozhan; Jeong, Jun-Ho; Rha, Jong-Joo; Kim, Ki-Don; Lee, Eung-Sug

    2007-01-01

    Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70-86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75 0 . The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin

  9. Selective binding of oligonucleotide on TiO2 surfaces modified by swift heavy ion beam lithography

    International Nuclear Information System (INIS)

    Vicente Pérez-Girón, J.; Hirtz, M.; McAtamney, C.; Bell, A.P.; Antonio Mas, J.; Jaafar, M.; Luis, O. de; Fuchs, H.

    2014-01-01

    We have used swift heavy-ion beam based lithography to create patterned bio-functional surfaces on rutile TiO 2 single crystals. The applied lithography method generates a permanent and well defined periodic structure of micrometre sized square holes having nanostructured TiO 2 surfaces, presenting different physical and chemical properties compared to the surrounding rutile single crystal surface. On the patterned substrates selective binding of oligonucleotides molecules is possible at the surfaces of the holes. This immobilisation process is only being controlled by UV light exposure. The patterned transparent substrates are compatible with fluorescence detection techniques, are mechanically robust, have a high tolerance to extreme chemical and temperature environments, and apparently do not degrade after ten cycles of use. These qualities make the patterned TiO 2 substrates useful for potential biosensor applications

  10. Selective binding of oligonucleotide on TiO{sub 2} surfaces modified by swift heavy ion beam lithography

    Energy Technology Data Exchange (ETDEWEB)

    Vicente Pérez-Girón, J. [Nanoate, S.L. C/Poeta Rafael Morales 2, San Sebastian de los Reyes, 28702 Madrid (Spain); Emerging Viruses Department Heinrich Pette Institute, Hamburg 20251 (Germany); Hirtz, M. [Institute of Nanotechnology (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe Institute of Technology - KIT, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); McAtamney, C.; Bell, A.P. [Advanced Microscopy Laboratory, CRANN, Trinity College Dublin, Dublin 2 (Ireland); Antonio Mas, J. [Laboratorio de Genómica del Centro de Apoyo Tecnológico, Universidad Rey Juan Carlos, Campus de Alcorcón 28922, Madrid (Spain); Jaafar, M. [Nanoate, S.L. C/Poeta Rafael Morales 2, San Sebastian de los Reyes, 28702 Madrid (Spain); Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad Autónoma de Madrid, Campus de Cantoblanco, 28049 Madrid (Spain); Luis, O. de [Nanoate, S.L. C/Poeta Rafael Morales 2, San Sebastian de los Reyes, 28702 Madrid (Spain); Departamento de Bioquímica, Fisiología y Genética Molecular, Facultad de Ciencias de la Salud, Universidad Rey Juan Carlos, Campus de Alcorcón, 28922 Madrid (Spain); Fuchs, H. [Institute of Nanotechnology (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe Institute of Technology - KIT, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Physical Institute and Center for Nanotechnology (CeNTech), Wilhelm-Klemm-Straße 10, University of Münster (Germany); and others

    2014-11-15

    We have used swift heavy-ion beam based lithography to create patterned bio-functional surfaces on rutile TiO{sub 2} single crystals. The applied lithography method generates a permanent and well defined periodic structure of micrometre sized square holes having nanostructured TiO{sub 2} surfaces, presenting different physical and chemical properties compared to the surrounding rutile single crystal surface. On the patterned substrates selective binding of oligonucleotides molecules is possible at the surfaces of the holes. This immobilisation process is only being controlled by UV light exposure. The patterned transparent substrates are compatible with fluorescence detection techniques, are mechanically robust, have a high tolerance to extreme chemical and temperature environments, and apparently do not degrade after ten cycles of use. These qualities make the patterned TiO{sub 2} substrates useful for potential biosensor applications.

  11. Educating in the Design and Construction of Built Environments Accessible to Disabled People: The Leonardo da Vinci AWARD Project

    Science.gov (United States)

    Frattari, Antonio; Dalpra, Michela; Bernardi, Fabio

    2013-01-01

    An interdisciplinary partnership within an European Leonardo da Vinci project has developed a new approach aimed at educating secondary school students in the creation of built environments accessible to disabled people and at sensitizing them towards the inclusion of people with disabilities in all realms of social life. The AWARD (Accessible…

  12. The Effect of a Graph-Oriented Computer-Assisted Project-Based Learning Environment on Argumentation Skills

    Science.gov (United States)

    Hsu, P. -S.; Van Dyke, M.; Chen, Y.; Smith, T. J.

    2015-01-01

    The purpose of this quasi-experimental study was to explore how seventh graders in a suburban school in the United States developed argumentation skills and science knowledge in a project-based learning environment that incorporated a graph-oriented, computer-assisted application. A total of 54 students (three classes) comprised this treatment…

  13. The hELENa project - I. Stellar populations of early-type galaxies linked with local environment and galaxy mass

    NARCIS (Netherlands)

    Sybilska, A.; Lisker, T.; Kuntschner, H.; Vazdekis, A.; van de Ven, G.; Peletier, R.; Falcón-Barroso, J.; Vijayaraghavan, R.; Janz, J.

    2017-01-01

    We present the first in a series of papers in The role of Environment in shaping Low-mass Early-type Nearby galaxies (hELENa) project. In this paper, we combine our sample of 20 low-mass early types (dEs) with 258 massive early types (ETGs) from the ATLAS3D survey - all observed with the SAURON

  14. Monitoring of Space and Earth electromagnetic environment by MAGDAS project: Collaboration with IKIR - Introduction to ICSWSE/MAGDAS project

    Directory of Open Access Journals (Sweden)

    Yoshikawa Akimasa

    2017-01-01

    Full Text Available For study of coupling processes in the Solar-Terrestrial System, International Center for Space Weather Science and Education (ICSWSE, Kyushu University has developed a real time magnetic data acquisition system (the MAGDAS project around the world. The number of observational sites is increasing every year with the collaboration of host countries. Now at this time, the MAGDAS Project has installed 78 real time magnetometers – so it is the largest magnetometer array in the world. The history of global observation at Kyushu University is over 30 years and number of developed observational sites is over 140. Especially, Collaboration between IKIR is extended back to 1990's. Now a time, we are operating Flux-gate magnetometer and FM-CW Radar. It is one of most important collaboration for space weather monitoring. By using MAGDAS data, ICSWSE produces many types of space weather index, such as EE-index (for monitoring long tern and shot term variation of equatorial electrojet, Pc5 index (for monitoring solar-wind velocity and high energy electron flux, Sq-index (for monitoring global change of ionospheric low and middle latitudinal current system, and Pc3 index (for monitoring of plasma density variation at low latitudes. In this report, we will introduce recent development of MAGDAS/ICSWSE Indexes project and topics for new open policy for MAGDAS data will be also discussed.

  15. Monitoring of Space and Earth electromagnetic environment by MAGDAS project: Collaboration with IKIR - Introduction to ICSWSE/MAGDAS project

    Science.gov (United States)

    Yoshikawa, Akimasa; Fujimoto, Akiko; Ikeda, Akihiro; Uozumi, Teiji; Abe, Shuji

    2017-10-01

    For study of coupling processes in the Solar-Terrestrial System, International Center for Space Weather Science and Education (ICSWSE), Kyushu University has developed a real time magnetic data acquisition system (the MAGDAS project) around the world. The number of observational sites is increasing every year with the collaboration of host countries. Now at this time, the MAGDAS Project has installed 78 real time magnetometers - so it is the largest magnetometer array in the world. The history of global observation at Kyushu University is over 30 years and number of developed observational sites is over 140. Especially, Collaboration between IKIR is extended back to 1990's. Now a time, we are operating Flux-gate magnetometer and FM-CW Radar. It is one of most important collaboration for space weather monitoring. By using MAGDAS data, ICSWSE produces many types of space weather index, such as EE-index (for monitoring long tern and shot term variation of equatorial electrojet), Pc5 index (for monitoring solar-wind velocity and high energy electron flux), Sq-index (for monitoring global change of ionospheric low and middle latitudinal current system), and Pc3 index (for monitoring of plasma density variation at low latitudes). In this report, we will introduce recent development of MAGDAS/ICSWSE Indexes project and topics for new open policy for MAGDAS data will be also discussed.

  16. Harnessing the Power of Technologies to Manage Collaborative e-Learning Projects in Dispersed Environments

    Science.gov (United States)

    Gosper, Maree Veroncia; McNeill, Margot Anne; Woo, Karen

    2010-01-01

    "The impact of web-based lecture technologies on current and future practice in learning and teaching" was a collaborative project across four Australian universities, funded by the Australian Learning and Teaching Council (ALTC). The project was both exploratory and developmental in nature and according to the project's external…

  17. An estimation method of the direct benefit of a waterlogging control project applicable to the changing environment

    Science.gov (United States)

    Zengmei, L.; Guanghua, Q.; Zishen, C.

    2015-05-01

    The direct benefit of a waterlogging control project is reflected by the reduction or avoidance of waterlogging loss. Before and after the construction of a waterlogging control project, the disaster-inducing environment in the waterlogging-prone zone is generally different. In addition, the category, quantity and spatial distribution of the disaster-bearing bodies are also changed more or less. Therefore, under the changing environment, the direct benefit of a waterlogging control project should be the reduction of waterlogging losses compared to conditions with no control project. Moreover, the waterlogging losses with or without the project should be the mathematical expectations of the waterlogging losses when rainstorms of all frequencies meet various water levels in the drainage-accepting zone. So an estimation model of the direct benefit of waterlogging control is proposed. Firstly, on the basis of a Copula function, the joint distribution of the rainstorms and the water levels are established, so as to obtain their joint probability density function. Secondly, according to the two-dimensional joint probability density distribution, the dimensional domain of integration is determined, which is then divided into small domains so as to calculate the probability for each of the small domains and the difference between the average waterlogging loss with and without a waterlogging control project, called the regional benefit of waterlogging control project, under the condition that rainstorms in the waterlogging-prone zone meet the water level in the drainage-accepting zone. Finally, it calculates the weighted mean of the project benefit of all small domains, with probability as the weight, and gets the benefit of the waterlogging control project. Taking the estimation of benefit of a waterlogging control project in Yangshan County, Guangdong Province, as an example, the paper briefly explains the procedures in waterlogging control project benefit estimation. The

  18. Hazardous materials in Aquatic environments of the Mississippi River basin. Quarterly project status report, 1 January 1994--30 March 1994

    Energy Technology Data Exchange (ETDEWEB)

    Abdelghani, A.

    1994-06-01

    Projects associated with this grant for studying hazardous materials in aquatic environments of the Mississippi River Basin are reviewed and goals, progress and research results are discussed. New, one-year initiation projects are described briefly.

  19. 3D Simulation of Nano-Imprint Lithography

    DEFF Research Database (Denmark)

    Román Marín, José Manuel; Rasmussen, Henrik K.; Hassager, Ole

    2010-01-01

    A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have...

  20. Report on the fifth workshop on synchrotron x ray lithography

    Science.gov (United States)

    Williams, G. P.; Godel, J. B.; Brown, G. S.; Liebmann, W.

    Semiconductors comprise a greater part of the United States economy than the aircraft, steel, and automobile industries combined. In future the semiconductor manufacturing industry will be forced to switch away from present optical manufacturing methods in the early to mid 1990s. X ray lithography has emerged as the leading contender for continuing production below the 0.4 micron level. Brookhaven National Laboratory began a series of workshops on x ray lithography in 1986 to examine key issues and in particular to enable United States industry to take advantage of the technical base established in this field. Since accelerators provide the brightest sources for x ray lithography, most of the research and development to date has taken place at large accelerator-based research centers such as Brookhaven, the University of Wisconsin, and Stanford. The goals of this Fifth Brookhaven Workshop were to review progress and goals since the last workshop and to establish a blueprint for the future. The meeting focused on the exposure tool, that is, a term defined as the source plus beamline and stepper. In order to assess the appropriateness of schedules for the development of this tool, other aspects of the required technology such as masks, resists and inspection and repair were also reviewed. To accomplish this, two working groups were set up, one to review the overall aspects of x ray lithography and set a time frame, the other to focus on sources.

  1. Structure formation in atom lithography using geometric collimation

    NARCIS (Netherlands)

    Meijer, T.; Beardmore, J.P.; Fabrie, C.G.C.H.M.; van Lieshout, J.P.; Notermans, R.P.M.J.W.; Sang, R.T.; Vredenbregt, E.J.D.; Leeuwen, van K.A.H.

    2011-01-01

    Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally

  2. Combined electron beam and UV lithography in SU-8

    DEFF Research Database (Denmark)

    Gersborg-Hansen, Morten; Thamdrup, Lasse Højlund; Mironov, Andrej

    2007-01-01

    We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features...

  3. Silicon Nanowire Fabrication Using Edge and Corner Lithography

    NARCIS (Netherlands)

    Yagubizade, H.; Berenschot, Johan W.; Jansen, Henricus V.; Elwenspoek, Michael Curt; Tas, Niels Roelof

    2010-01-01

    This paper presents a wafer scale fabrication method of single-crystalline silicon nanowires (SiNWs) bound by <111> planes using a combination of edge and corner lithography. These are methods of unconventional nanolithography for wafer scale nano-patterning which determine the size of nano-features

  4. Fabrication of nanoparticle and protein nanostructures using nanoimprint lithography

    NARCIS (Netherlands)

    Maury, P.A.

    2007-01-01

    Nanoimprint lithography (NIL) was used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The resulting polymer template behaved as a physical barrier preventing the formation of a SAM in the covered

  5. Fast thermal nanoimprint lithography by a stamp with integrated heater

    DEFF Research Database (Denmark)

    Tormen, Massimo; Malureanu, Radu; Pedersen, Rasmus Haugstrup

    2008-01-01

    We propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz...

  6. X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications

    International Nuclear Information System (INIS)

    Di Fabrizio, E; Fillipo, R; Cabrini, S

    2004-01-01

    ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT's soft and hard x-ray beam lines

  7. Multimode Resource-Constrained Multiple Project Scheduling Problem under Fuzzy Random Environment and Its Application to a Large Scale Hydropower Construction Project

    Science.gov (United States)

    Xu, Jiuping

    2014-01-01

    This paper presents an extension of the multimode resource-constrained project scheduling problem for a large scale construction project where multiple parallel projects and a fuzzy random environment are considered. By taking into account the most typical goals in project management, a cost/weighted makespan/quality trade-off optimization model is constructed. To deal with the uncertainties, a hybrid crisp approach is used to transform the fuzzy random parameters into fuzzy variables that are subsequently defuzzified using an expected value operator with an optimistic-pessimistic index. Then a combinatorial-priority-based hybrid particle swarm optimization algorithm is developed to solve the proposed model, where the combinatorial particle swarm optimization and priority-based particle swarm optimization are designed to assign modes to activities and to schedule activities, respectively. Finally, the results and analysis of a practical example at a large scale hydropower construction project are presented to demonstrate the practicality and efficiency of the proposed model and optimization method. PMID:24550708

  8. Multimode resource-constrained multiple project scheduling problem under fuzzy random environment and its application to a large scale hydropower construction project.

    Science.gov (United States)

    Xu, Jiuping; Feng, Cuiying

    2014-01-01

    This paper presents an extension of the multimode resource-constrained project scheduling problem for a large scale construction project where multiple parallel projects and a fuzzy random environment are considered. By taking into account the most typical goals in project management, a cost/weighted makespan/quality trade-off optimization model is constructed. To deal with the uncertainties, a hybrid crisp approach is used to transform the fuzzy random parameters into fuzzy variables that are subsequently defuzzified using an expected value operator with an optimistic-pessimistic index. Then a combinatorial-priority-based hybrid particle swarm optimization algorithm is developed to solve the proposed model, where the combinatorial particle swarm optimization and priority-based particle swarm optimization are designed to assign modes to activities and to schedule activities, respectively. Finally, the results and analysis of a practical example at a large scale hydropower construction project are presented to demonstrate the practicality and efficiency of the proposed model and optimization method.

  9. The communication in industrialised building system (IBS) construction project: Virtual environment

    Science.gov (United States)

    Pozin, Mohd Affendi Ahmad; Nawi, Mohd Nasrun Mohd

    2017-10-01

    Large portion of numbers team organization in the IBS construction sector is known are being fragmented. That is contributed from a segregation of construction activity thus create team working in virtually. Virtual team are the nature when teams are working in distributed area, across culture and time. Therefore, teams can be respond to the task without relocating to the site project and settle down a problem through information and communication technology (ICT). The emergence of virtual team are carry out by advancements in communication technologies as a medium to improve project team communication in project delivery process on IBS construction. Based on literature review from previous study and data collected from interviewing, this paper aim to identified communication challenges among project team members according to current project development practices in IBS construction project. Hence, in attempt to develop effective communication through the advantages of virtual team approach for IBS construction project. In order to ensure the data is gathered comprehensively and accurately, the data was collected from project managers by using semi structured interview method. It was found that virtual team approach could be enable competitive challenges on complexity in the construction project management process.

  10. Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly

    Science.gov (United States)

    Doise, Jan; Bekaert, Joost; Chan, Boon Teik; Hori, Masafumi; Gronheid, Roel

    2017-04-01

    Insertion of a graphoepitaxy directed self-assembly process as a via patterning technology into integrated circuit fabrication is seriously considered for the 7-nm node and beyond. At these dimensions, a graphoepitaxy process using a cylindrical block copolymer that enables hole multiplication can alleviate costs by extending 193-nm immersion-based lithography and significantly reducing the number of masks that would be required per layer. To be considered for implementation, it needs to be proved that this approach can achieve the required pattern quality in terms of defects and variability using a representative, aperiodic design. The patterning of a via layer from an actual 7-nm node logic layout is demonstrated using immersion lithography and graphoepitaxy directed self-assembly in a fab-like environment. The performance of the process is characterized in detail on a full 300-mm wafer scale. The local variability in an edge placement error of the obtained patterns (4.0 nm 3σ for singlets) is in line with the recent results in the field and significantly less than of the prepattern (4.9 nm 3σ for singlets). In addition, it is expected that pattern quality can be further improved through an improved mask design and optical proximity correction. No major complications for insertion of the graphoepitaxy directed self-assembly into device manufacturing were observed.

  11. Organizing vertical layout environments: a forward-looking development strategy for high-rise building projects

    Science.gov (United States)

    Magay, A. A.; Bulgakova, E. A.; Zabelina, S. A.

    2018-03-01

    The article highlights issues surrounding development of high rise buildings. With the rapid increase of the global population there has been a trend for people to migrate into megacities and has caused the expansion of big city territories. This trend, coupled with the desire for a comfortable living environment, has resulted in numerous problems plaguing the megacity. This article proposes that a viable solution to the problems facing megacities is to create vertical layout environments. Potential options for creating vertical layout environments are set out below including the construction of buildings with atriums. Further, the article puts forth suggested spatial organization of the environment as well as optimal landscaping of high-rise buildings and constructions for the creation of vertical layout environments. Finally, the persuasive reasons for the adoption of vertical layout environments is that it will decrease the amount of developed urban areas, decrease traffic and increase environmental sustainability.

  12. Participatory design in the project of virtual learning environment of histology

    OpenAIRE

    Santa-Rosa, José Guilherme da Silva

    2012-01-01

    This present article describes a research on the development, under the approach of participatory design, a virtual teaching-learning of Histology in which students and teachers participated actively in all stages of development of the educational environment. We postulates that the development of virtual learning environment of Histology, through the Participatory Design approach, contributes to greater acceptance and use by students and that the adoption of virtual environment for teaching ...

  13. Students in a School Environment: A Project Focused on Family Involvement of At-Risk

    Science.gov (United States)

    Denney, Pat

    2011-01-01

    This project examined family involvement of at risk students in mid-west communities. The purpose of this project was to study the affect of family involvement on at-risk student achievement. The redefining of the perception of America has resulted in a crisis of academic performance in the traditionally slow-changing education systems. This topic…

  14. How Teaching Science Using Project-Based Learning Strategies Affects the Classroom Learning Environment

    Science.gov (United States)

    Hugerat, Muhamad

    2016-01-01

    This study involved 458 ninth-grade students from two different Arab middle schools in Israel. Half of the students learned science using project-based learning strategies and the other half learned using traditional methods (non-project-based). The classes were heterogeneous regarding their achievements in the sciences. The adapted questionnaire…

  15. Use of a virtual world computer environment for international distance education: lessons from a pilot project using Second Life.

    Science.gov (United States)

    Schoonheim, Marloes; Heyden, Robin; Wiecha, John M

    2014-02-21

    Virtual worlds (VWs), in which participants navigate as avatars through three-dimensional, computer-generated, realistic-looking environments, are emerging as important new technologies for distance health education. However, there is relatively little documented experience using VWs for international healthcare training. The Geneva Foundation for Medical Education and Research (GFMER) conducted a VW training for healthcare professionals enrolled in a GFMER training course. This paper describes the development, delivery, and results of a pilot project undertaken to explore the potential of VWs as an environment for distance healthcare education for an international audience that has generally limited access to conventionally delivered education.

  16. The hELENa project - I. Stellar populations of early-type galaxies linked with local environment and galaxy mass

    OpenAIRE

    Sybilska, A.; Lisker, T.; Kuntschner, H.; Vazdekis, A.; van de Ven, G.; Peletier, R.; Falcón-Barroso, J.; Vijayaraghavan, R.; Janz, J.

    2017-01-01

    We present the first in a series of papers in T$h$e role of $E$nvironment in shaping $L$ow-mass $E$arly-type $N$earby g$a$laxies (hELENa) project. In this paper we combine our sample of 20 low-mass early types (dEs) with 258 massive early types (ETGs) from the ATLAS$^{\\mathrm{3D}}$ survey - all observed with the SAURON integral field unit (IFU) - to investigate early-type galaxies' stellar population scaling relations and the dependence of the population properties on local environment, exten...

  17. Women's perceived work environment after stress-related rehabilitation: experiences from the ReDO project.

    Science.gov (United States)

    Wästberg, Birgitta A; Erlandsson, Lena-Karin; Eklund, Mona

    2016-01-01

    The study aimed to investigate (a) if women's perceptions of their work environment changed during a 16-week rehabilitation period and at a 12-month follow-up; (b) whether such changes were related to outcomes in terms of return to work, well-being and valued occupations. Eighty-four gainfully employed women on sick-leave due to stress-related disorders responded to instruments assessing perceptions of the work environment, well-being (self-esteem, self-mastery, quality of life, perceived stress, self-rated health) and perceived occupational value. Data about return to work were collected from registers. Non-parametric statistics were used. The increase in the women's ratings of their work environment was non-significant between baseline and completed rehabilitation but was statistically significant between baseline and the 12-month follow-up. No relationships were found between changes in perceptions of the work environment and outcomes after the rehabilitation. At the follow-up, however, there were associations between perceived work environment changes in a positive direction and return to work; improved self-esteem, self-mastery, quality of life, perceived occupational value and self-rated health; and reduced stress. It seems important to consider the work environment in rehabilitation for stress-related problems, and a follow-up appears warranted to detect changes and associations not visible immediately after rehabilitation. Work environment Perceptions of the work environment seem important for return to work, although other factors are likely to contribute as well. Perceptions of the work environment are associated with several aspects of well-being. When developing rehabilitation interventions a focus on the clients' perceptions of their work environment seems vital.

  18. On Student Motivation in a Problem and Project-Based Satellite Development and Learning Environment

    DEFF Research Database (Denmark)

    Larsen, Jesper Abildgaard; Nielsen, Jens Frederik Dalsgaard; Zhou, Chunfang

    2013-01-01

    During the past decade, students at Aalborg University have had the possibility to participate in the cross disciplinary, and cross semester project of building and launching a cubesat. However, as such a project easily can last from three to five years, from the initial development to the launch...... of the satellite, it is important to consider how to keep the different student groups, who have participated in the project motivated in further developing of their respective subsystems, as well as engage actively in knowledge transfer to new student groups....

  19. Stigmergy-based Long-Term Monitoring of Indoor Users Mobility in Ambient Assisted Living Environments: the DOREMI Project Approach

    OpenAIRE

    Palumbo, Filippo; La Rosa, Davide; Ferro, Erina

    2016-01-01

    Aging trends in Europe motivate the need for technological solutions aimed at preventing the main causes of morbidity and premature mortality. In this framework, the DOREMI project addresses three important causes of morbidity and mortality in the elderly by devising an ICT-based home care services for aging people to contrast cognitive decline, sedentariness and unhealthy dietary habits. In DOREMI, the house itself is transformed in an unobtrusive monitoring environment able to keep track of...

  20. Testing a Novel Geopolymer Binder as a Refractory Material for Rocket Plume Environments at SSC Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The project involved the development and testing of a new alumina-silicate based multi-purpose, cost-effective, ‘green’ cementitious binder (geopolymer)...

  1. Development of the digital design environment ProjectWise(TM) - phase 1.

    Science.gov (United States)

    2017-04-28

    The goal of this research was to develop a project document management system capable of managing : Connecticut Department of Transportation (CTDOT) Capital Road and Bridge Program. Primary targets of : research and development included the system, c...

  2. Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies

    Energy Technology Data Exchange (ETDEWEB)

    Škriniarová, J., E-mail: jaroslava.skriniarova@stuba.sk [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Pudiš, D. [Department of Physics, University of Žilina, Žilina (Slovakia); Andok, R. [Department of E-Beam Lithography, Institute of Informatics, Slovak Academy of Sciences, Bratislava (Slovakia); Lettrichová, I. [Department of Physics, University of Žilina, Žilina (Slovakia); Uherek, F. [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia)

    2017-02-15

    Highlights: • Applicability of the AZ 5214E photoresist for three different lithographies. • Useful for the fabrication of 1D and 2D periodic and irregular structures. • 2D structures with 260 nm period achieved by the laser interference lithography. • Structures with period below 500 nm achieved with the e-beam direct-write lithography. • Holes of 270 nm diameter made by the near-field scanning optical microscopy lithography. - Abstract: In this paper we show a comparison of chosen lithographies used for the AZ 5214E photoresist, which is normally UV sensitive but has also been investigated for its sensitivity to e-beam exposure. Three lithographies, the E-Beam Direct Write lithography (EBDW), laser Interference Lithography (IL) and the non-contact Near-field Scanning Optical Microscopy (NSOM) lithography, are discussed here and the results on exposed arrays of simple patterns are shown. With the EBDW and IL we achieved periods of the structures around half-micron, and we demonstrate attainability of dimensions smaller or comparable than usually achieved by a standard optical photolithography with the investigated photoresist. With the non-contact NSOM lithography structures with periods slightly above a micron were achieved.

  3. FOX: A Fault-Oblivious Extreme-Scale Execution Environment Boston University Final Report Project Number: DE-SC0005365

    Energy Technology Data Exchange (ETDEWEB)

    Appavoo, Jonathan [Boston Univ., MA (United States)

    2013-03-17

    Exascale computing systems will provide a thousand-fold increase in parallelism and a proportional increase in failure rate relative to today's machines. Systems software for exascale machines must provide the infrastructure to support existing applications while simultaneously enabling efficient execution of new programming models that naturally express dynamic, adaptive, irregular computation; coupled simulations; and massive data analysis in a highly unreliable hardware environment with billions of threads of execution. The FOX project explored systems software and runtime support for a new approach to the data and work distribution for fault oblivious application execution. Our major OS work at Boston University focused on developing a new light-weight operating systems model that provides an appropriate context for both multi-core and multi-node application development. This work is discussed in section 1. Early on in the FOX project BU developed infrastructure for prototyping dynamic HPC environments in which the sets of nodes that an application is run on can be dynamically grown or shrunk. This work was an extension of the Kittyhawk project and is discussed in section 2. Section 3 documents the publications and software repositories that we have produced. To put our work in context of the complete FOX project contribution we include in section 4 an extended version of a paper that documents the complete work of the FOX team.

  4. Structuring of diamond films using microsphere lithography

    Czech Academy of Sciences Publication Activity Database

    Domonkos, Mária; Ižák, Tibor; Štolcová, L.; Proška, J.; Demo, Pavel; Kromka, Alexander

    2014-01-01

    Roč. 54, č. 5 (2014), s. 320-324 ISSN 1210-2709 R&D Projects: GA ČR(CZ) GBP108/12/G108 Institutional support: RVO:68378271 Keywords : nanostructuring * diamond thin films * polystyrene microspheres * reactive ion etching * scanning electron microscopy Subject RIV: BM - Solid Matter Physics ; Magnetism

  5. MEE-project: One year of public relations on the environment and energy. MEE-projekt: Een jaar voorlichten over milieu en energie

    Energy Technology Data Exchange (ETDEWEB)

    Anon.

    1991-06-26

    A final overview is presented of the MEE-project ('Milieu- En Energie projekt' or Environmental and Energy project). The MEE-project was aimed at stimulating energy saving and improving the public attitude concerning energy and the environment. The project is also considered as an employment project for the unemployed. The main target group of the project was the households in the Dutch municipality Heerhugowaard. Five persons in search of employment offered interested private households options to save energy and the environment within their own surroundings by means of information and documentation. 5610 information packets were delivered. The costs did not exceed 115,000 Dutch guilders. The overall conclusion is positive: the people of the municipality are active in trying to save energy and the environment. Four of the five project members have new and better perspectives for a job.

  6. Genetic algorithm for project time-cost optimization in fuzzy environment

    Directory of Open Access Journals (Sweden)

    Khan Md. Ariful Haque

    2012-12-01

    Full Text Available Purpose: The aim of this research is to develop a more realistic approach to solve project time-cost optimization problem under uncertain conditions, with fuzzy time periods. Design/methodology/approach: Deterministic models for time-cost optimization are never efficient considering various uncertainty factors. To make such problems realistic, triangular fuzzy numbers and the concept of a-cut method in fuzzy logic theory are employed to model the problem. Because of NP-hard nature of the project scheduling problem, Genetic Algorithm (GA has been used as a searching tool. Finally, Dev-C++ 4.9.9.2 has been used to code this solver. Findings: The solution has been performed under different combinations of GA parameters and after result analysis optimum values of those parameters have been found for the best solution. Research limitations/implications: For demonstration of the application of the developed algorithm, a project on new product (Pre-paid electric meter, a project under government finance launching has been chosen as a real case. The algorithm is developed under some assumptions. Practical implications: The proposed model leads decision makers to choose the desired solution under different risk levels. Originality/value: Reports reveal that project optimization problems have never been solved under multiple uncertainty conditions. Here, the function has been optimized using Genetic Algorithm search technique, with varied level of risks and fuzzy time periods.

  7. A new lithography of functional plasma polymerized thin films

    International Nuclear Information System (INIS)

    Kim, Sung-O

    2001-01-01

    The preparation of the resist for the vacuum lithography was carried out by plasma polymerization. The resist manufactured by plasma polymerization is a monomer produced by MMA (Methyl methacrylate). The functional groups of MMA appeared in the PPMMA (Plasma Polymerized Methyl methacrylate) as well, and this was confirmed through an analysis using FT-IR. The polymerization rate increased as a function of the plasma power and decreased as a function of the system pressure. The sensitivity and contrast of the plasma polymerized thin films were 15 μC/cm2 and 4.3 respectively. The size of the pattern manufactured by Vacuum Lithography using the plasma polymerized thin films was 100 nm

  8. Maskless, parallel patterning with zone-plate array lithography

    International Nuclear Information System (INIS)

    Carter, D. J. D.; Gil, Dario; Menon, Rajesh; Mondol, Mark K.; Smith, Henry I.; Anderson, Erik H.

    1999-01-01

    Zone-plate array lithography (ZPAL) is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate. An experimental ultraviolet ZPAL system has been constructed and used to simultaneously expose nine different patterns with a 3x3 array of zone plates in a quasidot-matrix fashion. We present exposed patterns, describe the system design and construction, and discuss issues essential to a functional ZPAL system. We also discuss another ZPAL system which operates with 4.5 nm x radiation from a point source. We present simulations which show that, with our existing x-ray zone plates and this system, we should be able to achieve 55 nm resolution. (c) 1999 American Vacuum Society

  9. Soft X-ray microscopy and lithography with synchrotron radiation

    International Nuclear Information System (INIS)

    Gudat, W.

    1977-12-01

    Considerable progress in the technique microscopy with soft X-ray radiation has been achieved in particular through the application of synchrotron radiation. Various methods which are currently being studied theoretically or already being used practically will be described briefly. Attention is focussed on the method of contact microscopy. Various biological specimens have been investigated by this method with a resolution as good as 100 A. X-ray lithography which in the technical procedure is very similar to contact microscopy gives promise for the fabrication of high quality submicron structures in electronic device production. Important factors limiting the resolution and determining the performance of contact microscopy and X-ray lithography will be discussed. (orig.) [de

  10. Metal layer mask patterning by force microscopy lithography

    International Nuclear Information System (INIS)

    Filho, H.D. Fonseca; Mauricio, M.H.P.; Ponciano, C.R.; Prioli, R.

    2004-01-01

    The nano-lithography of a metallic surface in air by atomic force microscopy while operated in contact mode and equipped with a diamond tip is presented. The aluminum mask was prepared by thermal deposition on arsenic sulfide films. The analysis of the scratches performed by the tip on the metallic mask show that the depth of the lithographed pattern increases with the increase of the applied normal force. The scanning velocity is also shown to influence the AFM patterning process. As the scanning velocity increases, the scratch depth and width decreases. Nano-indentations performed with the diamond tip show that the plastically deformed surface increases with the increase of the duration of the applied force. The use of the nano-lithography method to create nano-structures is discussed

  11. V-groove plasmonic waveguides fabricated by nanoimprint lithography

    DEFF Research Database (Denmark)

    Fernandez-Cuesta, I.; Nielsen, R.B.; Boltasseva, Alexandra

    2007-01-01

    Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integra...... of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput. © 2007 American Vacuum Society......Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication...

  12. Projects for increasing job satisfaction and creating a healthy work environment.

    Science.gov (United States)

    Brunges, Michele; Foley-Brinza, Christine

    2014-12-01

    Workplace culture is one of the biggest factors driving employee commitment and engagement. Multiple studies have shown that hospitals will perform better over time if employees are committed to their jobs and engaged in what they do. By creating and implementing multiple projects during a three-year period, a team at the University of Florida Health Shands Hospital, Gainesville, increased job satisfaction. Projects included ensuring meal breaks were offered, creating a serenity area, developing the patient ambassador role, actively addressing bullying and unprofessional behavior, assigning a student mentee to work with staff members on culture change, offering regular fun activities, redesigning the unit, reorganizing schedules to reduce stress, implementing education and training initiatives, establishing a Unit Practice Council, and implementing reward and recognition programs. Survey results and anecdotal evidence suggest that these projects combined to increase employee satisfaction and employee retention rates. Copyright © 2014 AORN, Inc. Published by Elsevier Inc. All rights reserved.

  13. Structuring Requirements in a Multi-Project Environment in the Construction Industry

    DEFF Research Database (Denmark)

    Wörösch, Michael

    2012-01-01

    Being in control of requirements in building projects is vital, since it helps securing the often small profit margins and the reputation of the responsible company. Hence this research aims to introduce requirements management to the construction industry. By means of case study and action...... in this industry, yet, success is here defined as an accomplished and accepted implementation of requirements management processes that are used by the relevant project members in their daily work and where the benefits of implementing requirements management outweighs the cost of invested resources. Furthermore...... it is argued that when running technology development, product development, product platform development, and a portfolio of building projects at the same time the use of requirements management is advantageous and an intelligent way of structuring requirements is needed. This article also demonstrates...

  14. Environment as a home to architecture. The Cremona City Hub project

    Directory of Open Access Journals (Sweden)

    Emilio Faroldi

    2014-10-01

    Full Text Available The urban regeneration pro- ject of the former Marketplace area promoted by the Local Administration in Cremona through a two-step international contest which ended in May 2012, relies on the willingness to guarantee new and high standards of welcoming and liveability within a logic of “smart city” to be meant as an healthy, dynamic and economically sustainable city. The promotion of energy policies, the close connection between the urban and the architectural project, a new dimension of welcoming and residentiality, the environmental quality, and the fruition of culture, represent questions to which new project development capabilities intend to ensure adequate answers. The experimental research of the Cremona City Hub project targets these very values.

  15. The UNOSAT-GRID Project: Access to Satellite Imagery through the Grid Environment

    CERN Document Server

    Méndez-Lorenzo, P; Lamanna, M; Meyer, X; Lazeyras, M; Bjorgo, E; Retiere, A; Falzone, A; Venuti, N; Maccarone, S; Ugolotti, B

    2007-01-01

    UNOSAT is a United Nations activity to provide access to satellite images and geographic system services for humanitarian operations for rescue or aid activities. UNOSAT is implemented by the UN Institute for Training and Research (UNITAR) and managed by the UN Office for Project Services (UNOPS). In addition, partners from different organizations constitute the UNOSAT consortium. Among these partners, CERN participates actively providing the required computational and storage resources. The critical part of the UNOSAT activity is the storage and processing of large quantities of satellite images. The fast and secure access to these images from any part of the world is mandatory during these activities. Based on two successful CERN-GRID/UNOSAT pilot projects (data storage/compression/download and image access through mobile phone), the GRIDUNOSAT project has consolidated the considerable work undertaken so far in the present activity. The main use case already demonstrated is the delivery of satellite images ...

  16. The superconducting x-ray lithography source program at Brookhaven

    Energy Technology Data Exchange (ETDEWEB)

    Williams, G. P.; Heese, R. N.; Vignola, G.; Murphy, J. B.; Godel, J. B.; Hsieh, H.; Galayda, J.; Seifert, A.; Knotek, M. L.

    1989-07-01

    A compact electron storage ring with superconducting dipole magnets, is being developed at the National Synchrotron Light Source at Brookhaven. The parameters of the source have been optimized for its future use as an x-ray source for lithography. This first ring is a prototype which will be used to study the operating characteristics of machines of this type with particular attention being paid to low-energy injection and long beam lifetime.

  17. ILT optimization of EUV masks for sub-7nm lithography

    Science.gov (United States)

    Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

    2017-06-01

    The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

  18. 450mm wafer patterning with jet and flash imprint lithography

    Science.gov (United States)

    Thompson, Ecron; Hellebrekers, Paul; Hofemann, Paul; LaBrake, Dwayne L.; Resnick, Douglas J.; Sreenivasan, S. V.

    2013-09-01

    The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental health and safety concerns, wafer standards, metrology capability, individual process module development and device integration. For 450mm, an aggressive goal of 2018 has been set, with pilot line operation as early as 2016. To address these goals, consortiums have been formed to establish the infrastructure necessary to the transition, with a focus on the development of both process and metrology tools. Central to any process module development, which includes deposition, etch and chemical mechanical polishing is the lithography tool. In order to address the need for early learning and advance process module development, Molecular Imprints Inc. has provided the industry with the first advanced lithography platform, the Imprio® 450, capable of patterning a full 450mm wafer. The Imprio 450 was accepted by Intel at the end of 2012 and is now being used to support the 450mm wafer process development demands as part of a multi-year wafer services contract to facilitate the semiconductor industry's transition to lower cost 450mm wafer production. The Imprio 450 uses a Jet and Flash Imprint Lithography (J-FILTM) process that employs drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for markets including NAND Flash memory, patterned media for hard disk drives and displays. This paper reviews the recent performance of the J-FIL technology (including overlay, throughput and defectivity), mask development improvements provided by Dai Nippon Printing, and the application of the technology to a 450mm lithography platform.

  19. Performance of the IBM synchrotron X-ray source for lithography

    International Nuclear Information System (INIS)

    Archie, C.

    1993-01-01

    The compact superconducting synchrotron X-ray source at the IBM Advanced Lithography Facility in East Fishkill, New York has been in service to customers since the start of 1992. It availability during scheduled time is greater than 90%, with recent months frequently surpassing 95%. Data on the long-term behavior of the X-ray source properties and subsystem performance are now available. The full system continues to meet all specifications and even to surpass them in key areas. Measured electron beam properties such as beam size, short- and long-term positional stability, and beam life are presented. Lifetimes greater than 20 hours for typical stored beams have significantly simplified operations and increased availability compared to projections. This paper also describes some unique features of this X-ray source and goes beyond a discussion of downtime to describe the efforts behind the scenes to maintain and operate it

  20. Environment

    International Nuclear Information System (INIS)

    Anon.

    1991-01-01

    IGT's efforts in environmental protection are primarily concerned with reducing the level of undesirable emissions from combustion, treating solid and liquid waste materials, and producing cleaner fuels. Projects being funded include: an ultra-low-emission gas-fired cyclonic burner for firetube boiler retrofit; a combination of IGT's de-NOX technology for municipal solid waste combustors with the injection of sorbents to reduce pollutants; second-generation NOx reduction techniques for regenerative glass melting furnaces; investigation of the applicability of electric DC field flame stabilization; development of a slagging cyclonic combustor for a class of industrial solid wastes; remediation research of various biological, chemical, and thermal technologies for cleaning and/or immobilizing contaminants in soils and sludges; and fuel cell research on molten carbonate and solid oxide fuel cells

  1. Part Summary of the Project ‘Speakers’ Comfort’: Teachers’ Voice use in Teaching Environments

    DEFF Research Database (Denmark)

    Lyberg-Åhlander, Viveka; Rydell, Roland; Löfqvist, Anders

    2015-01-01

    Classroom acoustics not always take the speaker’s comfort into consideration. The purpose of the presented papers was to investigate voice use, vocal behavior and prevalence of voice problems in Swedish teaching staff. Ratings of features in the work-environment on voice use were explored in n...... = 487 teachers. Based on their answers the respondents were split into two groups: teachers with self-assessed voice problems and voice-healthy teachers. Teachers with voice problems and were matched to a voice-healthy colleague from the same school and were investigated and compared for clinical...... findings and for vocal behavior. Acoustic properties of their teaching environments were measured. Teachers with voice-problems were more affected by any loading factor in the work-environment and were more aware of the room acoustics. Differences between the groups were found during field...

  2. Imprint lithography: lab curiosity or the real NGL

    Science.gov (United States)

    Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Bailey, Todd C.; Johnson, Stephen C.; Stacey, Nicholas A.; Ekerdt, John G.; Willson, C. Grant; Sreenivasan, S. V.; Schumaker, Norman E.

    2003-06-01

    The escalating cost for Next Generation Lithography (NGL) tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, a prohibitive number for many companies. As a result, several researchers are looking at low cost alternative methods for printing sub-100 nm features. In the mid-1990s, several resarech groups started investigating different methods for imprinting small features. Many of these methods, although very effective at printing small features across an entire wafer, are limited in their ability to do precise overlay. In 1999, Willson and Sreenivasan discovered that imprinting could be done at low pressures and at room temperatures by using low viscosity UV curable monomers. The technology is typically referred to as Step and Flash Imprint Lithography. The use of a quartz template enabled the photocuring process to occur and also opened up the potential for optical alignment of teh wafer and template. This paper traces the development of nanoimprint lithography and addresses the issues that must be solved if this type of technology is to be applied to high-density silicon integrated circuitry.

  3. The ECO European Project: A New MOOC Dimension Based on an Intercreativity Environment

    Science.gov (United States)

    Acedo, Sara Osuna; Cano, Lucía Camarero

    2016-01-01

    The ECO European Project funded by the European Commission is dedicated to bringing MOOCs to a new dimension by taking advantage of the new possibilities offered by the Social Web (O'Reilly, 2005). This paper focuses on the intercreative aspects of MOOCs. It takes a look at the characteristics of the new ECO MOOCs to see if they are designed and…

  4. Automatic Code Checking Applied to Fire Fighting and Panic Projects in a BIM Environment - BIMSCIP

    Directory of Open Access Journals (Sweden)

    Marcelo Franco Porto

    2017-06-01

    Full Text Available This work presents a computational implementation of an automatic conformity verification of building projects using a 3D modeling platform for BIM. This program was developed in C# language and based itself on the 9th Technical Instruction from Military Fire Brigade of the State of Minas Gerais which covers regulations of fire load in buildings and hazardous areas.

  5. Sakhalin 2, phase 2 project : meeting the Arctic challenge in a sub-Arctic environment

    International Nuclear Information System (INIS)

    Reece, A.; Gerges, A.; Efthymiou, M.; Winkler, M.

    2008-01-01

    Sakhalin Energy's objective is to commercially develop, operate and market the hydrocarbon resources and associated infrastructure governed by the Sakhalin 2 licenses for the sustainable benefit of shareholders, the Russian Federation, the Sakhalin Oblast and the wider community. This presentation discussed Sakhalin Energy's holdings including its investment company and hydrocarbon projects in eastern Russia. The Sakhalin area is a remote island that lacks infrastructure, has a low population density, with a rich onshore and offshore wildlife. It is a seismically active area, with seasonal operating windows, drifting pack ice from December to June, waves up to 18 metre maximum height, and frequent fog in spring and summer. The temperature also varies from 28 degrees Celsius to -40 degrees Celsius. The presentation also addressed the rerouting of offshore pipelines to ensure the least possible disturbance to western gray whale migration. Several photographs and illustrations of the phase 1 project were presented. Open water conditions were also illustrated. The phase 2 project was then outlined. This included illustrations of the platform, plant and export terminal, and onshore processing facility. Other photographs that were shown in the presentation included the offshore pipeline installation; a view of the shore approach to the pipeline installation; oil spill response; and escape, evacuation, and response. The design challenges and design philosophy of the project were also identified. The presentation concluded with a discussion of ice loading and platform response. figs

  6. Sakhalin 2, phase 2 project : meeting the Arctic challenge in a sub-Arctic environment

    Energy Technology Data Exchange (ETDEWEB)

    Reece, A.; Gerges, A.; Efthymiou, M.; Winkler, M. [Sakhalin Energy, Moscow (Russian Federation)

    2008-09-15

    Sakhalin Energy's objective is to commercially develop, operate and market the hydrocarbon resources and associated infrastructure governed by the Sakhalin 2 licenses for the sustainable benefit of shareholders, the Russian Federation, the Sakhalin Oblast and the wider community. This presentation discussed Sakhalin Energy's holdings including its investment company and hydrocarbon projects in eastern Russia. The Sakhalin area is a remote island that lacks infrastructure, has a low population density, with a rich onshore and offshore wildlife. It is a seismically active area, with seasonal operating windows, drifting pack ice from December to June, waves up to 18 metre maximum height, and frequent fog in spring and summer. The temperature also varies from 28 degrees Celsius to -40 degrees Celsius. The presentation also addressed the rerouting of offshore pipelines to ensure the least possible disturbance to western gray whale migration. Several photographs and illustrations of the phase 1 project were presented. Open water conditions were also illustrated. The phase 2 project was then outlined. This included illustrations of the platform, plant and export terminal, and onshore processing facility. Other photographs that were shown in the presentation included the offshore pipeline installation; a view of the shore approach to the pipeline installation; oil spill response; and escape, evacuation, and response. The design challenges and design philosophy of the project were also identified. The presentation concluded with a discussion of ice loading and platform response. figs.

  7. Increase of Investment Appeal of Projects for Noise Control Measures in Urban Environment

    Science.gov (United States)

    Kolmakov, A. V.; Ignatyeva, V. O.

    2017-11-01

    The authors analyzed the contemporary noise pollution level in the large cities of the Russian Federation. The article identifies the factors causing the reduction of acoustically comfortable urban territories. It states the task for the increase of investment appeal of the projects aimed at noise control measures adoption.

  8. The Changing Environment and Changing Institution: Indian Project of the Northeast Kansas Library System

    Science.gov (United States)

    Cunningham, William D.

    1971-01-01

    The chief features of the program's first year were the establishment of a liason between the library and identifiable service needs within the community, the second year was for developing the communication center approach; and development of special services and a cultural awareness program were projected for the third and fourth years. (2…

  9. Choose to Use: Scaffolding for Technology Learning Needs in a Project-Based Learning Environment

    Science.gov (United States)

    Weimer, Peggy D.

    2017-01-01

    Project-based learning is one approach used by teachers to meet the challenge of developing more technologically proficient students. This approach, however, requires students to manage a large number of tasks including the mastery of technology. If a student's perception that their capability to perform a task falls below the task's difficulty,…

  10. The Adoption of Mobile Learning in a Traditional Training Environment: The C95-Challenge Project Experience

    Science.gov (United States)

    Catenazzi, Nadia; Sommaruga, Lorenzo; De Angelis, Kylene; Gabbianelli, Giulio

    2016-01-01

    Within the C95-Challenge Erasmus+ project, mobile learning technologies are adopted and tested for bus and truck drivers training according to the EU 2003/59/EC Directive. Different kinds of training contents are developed in the form of interactive slides, hyper-videos, interactive quizzes and delivered on mobile devices. Existing apps and games…

  11. Delivering Software Process-Specific Project Courses in Tertiary Education Environment: Challenges and Solution

    Science.gov (United States)

    Rong, Guoping; Shao, Dong

    2012-01-01

    The importance of delivering software process courses to software engineering students has been more and more recognized in China in recent years. However, students usually cannot fully appreciate the value of software process courses by only learning methodology and principle in the classroom. Therefore, a process-specific project course was…

  12. [Air pollutant exposure during pregnancy and fetal and early childhood development. Research protocol of the INMA (Childhood and Environment Project)].

    Science.gov (United States)

    Esplugues, Ana; Fernández-Patier, Rosalía; Aguilera, Inma; Iñíguez, Carmen; García Dos Santos, Saúl; Aguirre Alfaro, Amelia; Lacasaña, Marina; Estarlich, Marisa; Grimalt, Joan O; Fernández, Marieta; Rebagliato, Marisa; Sala, María; Tardón, Adonina; Torrent, Maties; Martínez, María Dolores; Ribas-Fitó, Núria; Sunyer, Jordi; Ballester, Ferran

    2007-01-01

    The INMA (INfancia y Medio Ambiente [Spanish for Environment and Childhood]) project is a cooperative research network. This project aims to study the effects of environment and diet on fetal and early childhood development. This article aims to present the air pollutant exposure protocol during pregnancy and fetal and early childhood development of the INMA project. The information to assess air pollutant exposure during pregnancy is based on outdoor measurement of air pollutants (nitrogen dioxide [NO2], volatile organic compounds [VOC], ozone, particulate matter [PM10, PM2,5 ] and of their composition [polycyclic aromatic hydrocarbons]); measurement of indoor and personal exposure (VOC and NO2); urinary measurement of a biological marker of hydrocarbon exposure (1-hydroxypyrene); and data gathered by questionnaires and geographic information systems. These data allow individual air pollutant exposure indexes to be developed, which can then be used to analyze the possible effects of exposure on fetal development and child health. This protocol and the type of study allow an approximation to individual air pollutant exposure to be obtained. Finally, the large number of participants (N = 4,000), as well as their geographic and social diversity, increases the study's potential.

  13. Physics-based Space Weather Forecasting in the Project for Solar-Terrestrial Environment Prediction (PSTEP) in Japan

    Science.gov (United States)

    Kusano, K.

    2016-12-01

    Project for Solar-Terrestrial Environment Prediction (PSTEP) is a Japanese nation-wide research collaboration, which was recently launched. PSTEP aims to develop a synergistic interaction between predictive and scientific studies of the solar-terrestrial environment and to establish the basis for next-generation space weather forecasting using the state-of-the-art observation systems and the physics-based models. For this project, we coordinate the four research groups, which develop (1) the integration of space weather forecast system, (2) the physics-based solar storm prediction, (3) the predictive models of magnetosphere and ionosphere dynamics, and (4) the model of solar cycle activity and its impact on climate, respectively. In this project, we will build the coordinated physics-based model to answer the fundamental questions concerning the onset of solar eruptions and the mechanism for radiation belt dynamics in the Earth's magnetosphere. In this paper, we will show the strategy of PSTEP, and discuss about the role and prospect of the physics-based space weather forecasting system being developed by PSTEP.

  14. Analysis of technology and development plan on Lithography process of display industry and semiconductor

    International Nuclear Information System (INIS)

    2005-02-01

    This reports the seminar on Lithography in 2005, which includes these contents; Introduction of Lithography, equipment in NNFC, Exposure technology with fabrication, basic and application optics, RET and Lens aberrations, Alignment and Overlay and Metrology, Resist process with prime, mechanism, issues, resist technology and track system, Mask and OPC such as mask, fabrication, mask technology, proximity effect and OPC, Next generation, Lithography with NGL, Immersion and imprint. In the last, there are questions and answers.

  15. Low cost ESR based X-ray beamline for lithography experimentation

    Energy Technology Data Exchange (ETDEWEB)

    Kovacs, S.; Doumas, A.; Truncale, M. (Grumman Corp., Bethpage, NY (United States). Space and Electronics Div.)

    1992-08-01

    Any application of the electron storage ring (ESR) based X-ray lithography technology requires an X-ray radiation transport system to transfer the synchrotron radiation into a spectrum defined by the lithography process requirements. Structure of this transport system (i.e. the beamline) depends on the nature of the application. In this paper a beamline conceptual design will be discussed. The beamline is intended for the developmment of X-ray lithography technology. (orig.).

  16. An Interdisciplinary Design Project in Second Life: Creating a Virtual Marine Science Learning Environment

    Science.gov (United States)

    Triggs, Riley; Jarmon, Leslie; Villareal, Tracy A.

    2010-01-01

    Virtual environments can resolve many practical and pedagogical challenges within higher education. Economic considerations, accessibility issues, and safety concerns can all be somewhat alleviated by creating learning activities in a virtual space. Because of the removal of real-world physical limitations like gravity, durability and scope,…

  17. Kansas: Wichita Initiative to Renew the Environment (A Former EPA CARE Project)

    Science.gov (United States)

    Wichita Initiative to Renew the Environment is a recipient of a CARE Level II Cooperative agreement to reduce the risk of mobile air emissions, reduce the risk of storm water run-off, reduce the risk of solid waste pollution/greenhouse gas emissions

  18. Renewable energy sources project appraisal under uncertainty: the case of wind energy exploitation within a changing energy market environment

    International Nuclear Information System (INIS)

    Venetsanos, K.; Angelopoulou, P.; Tsoutsos, T.

    2002-01-01

    There are four elements, which contribute to the oncoming increase of electricity demand: climate changes, the expected growth rates of EU Member State economies, changes in the consumption patterns and the introduction of new technologies. The new deregulated Electricity Market is expected to respond to this challenge and the energy supply will be adequate and cost effective within this new environment which offers promising opportunities for power producers both existing and newcomers. In this paper a framework for the appraisal of power projects under uncertainty within a competitive market environment is identified, focusing on the electricity from Renewable Energy Sources. To this end the wind energy-to-electricity, production in Greece will serve as a case study. The subject matter is centred on the following areas: the uncertainties within the new deregulated energy market; the evaluation methods including an analysis of the introduced uncertainties after deregulation and a new approach to project evaluation using the real options, as well as comparison of the valuation methodologies within the new environment drawing from the case for Greece. (author)

  19. Social Sciences, Art and Physical Activity in Leisure Environments. An Inter-Disciplinary Project for Teacher Training

    Directory of Open Access Journals (Sweden)

    María Belén San Pedro Veledo

    2018-05-01

    Full Text Available Factors such as social change and increasing urbanization processes in the early years of the 21st century have caused a reduction in the amount of time that children devote to leisure activities in the open-air, resulting in more sedentary lifestyles than children in previous decades. An education in healthy habits from early ages to increase children’s physical and mental well-being together with their level of cultural knowledge contributes to the acquisition of a Leisure Culture that allows children to perceive the close environment as a scene for learning and enjoyment. It is thus be necessary for schools to foster pedagogical experiences, taking the physical and cultural environment as teaching resources. An innovation project is proposed which will be implemented with 25 university students from the School of Teacher Training and Education at the University of Oviedo (Oviedo, Spain. The project will consist of the proposal of educational itineraries through the city of Oviedo and Mount Naranco. As teachers-to-be, students must combine knowledge of the related areas and generate inter-disciplinary activities throughout the routes that will foster respect for the environment and leisure based on culture and physical activity, attitudes that they will transmit to their own students in the future.

  20. Environment

    International Nuclear Information System (INIS)

    McIntyre, A.D.; Turnbull, R.G.H.

    1992-01-01

    The development of the hydrocarbon resources of the North Sea has resulted in both offshore and onshore environmental repercussions, involving the existing physical attributes of the sea and seabed, the coastline and adjoining land. The social and economic repercussions of the industry were equally widespread. The dramatic and speedy impact of the exploration and exploitation of the northern North Sea resources in the early 1970s, on the physical resources of Scotland was quickly realised together with the concern that any environmental and social damage to the physical and social fabric should be kept to a minimum. To this end, a wide range of research and other activities by central and local government, and other interested agencies was undertaken to extend existing knowledge on the marine and terrestrial environments that might be affected by the oil and gas industry. The outcome of these activities is summarized in this paper. The topics covered include a survey of the marine ecosystems of the North Sea, the fishing industry, the impact of oil pollution on seabirds and fish stocks, the ecology of the Scottish coastline and the impact of the petroleum industry on a selection of particular sites. (author)

  1. 75 FR 81643 - In the Matter of Certain Semiconductor Products Made by Advanced Lithography Techniques and...

    Science.gov (United States)

    2010-12-28

    ... Semiconductor Products Made by Advanced Lithography Techniques and Products Containing Same; Notice of... Mexico) (``STC''), alleging a violation of section 337 in the importation, sale for [[Page 81644

  2. Lithography alternatives meet design style reality: How do they "line" up?

    Science.gov (United States)

    Smayling, Michael C.

    2016-03-01

    Optical lithography resolution scaling has stalled, giving innovative alternatives a window of opportunity. One important factor that impacts these lithographic approaches is the transition in design style from 2D to 1D for advanced CMOS logic. Just as the transition from 3D circuits to 2D fabrication 50 years ago created an opportunity for a new breed of electronics companies, the transition today presents exciting and challenging time for lithographers. Today, we are looking at a range of non-optical lithography processes. Those considered here can be broadly categorized: self-aligned lithography, self-assembled lithography, deposition lithography, nano-imprint lithography, pixelated e-beam lithography, shot-based e-beam lithography .Do any of these alternatives benefit from or take advantage of 1D layout? Yes, for example SAPD + CL (Self Aligned Pitch Division combined with Complementary Lithography). This is a widely adopted process for CMOS nodes at 22nm and below. Can there be additional design / process co-optimization? In spite of the simple-looking nature of 1D layout, the placement of "cut" in the lines and "holes" for interlayer connections can be tuned for a given process capability. Examples of such optimization have been presented at this conference, typically showing a reduction of at least one in the number of cut or hole patterns needed.[1,2] Can any of the alternatives complement each other or optical lithography? Yes.[3] For example, DSA (Directed Self Assembly) combines optical lithography with self-assembly. CEBL (Complementary e-Beam Lithography) combines optical lithography with SAPD for lines with shot-based e-beam lithography for cuts and holes. Does one (shrinking) size fit all? No, that's why we have many alternatives. For example NIL (Nano-imprint Lithography) has been introduced for NAND Flash patterning where the (trending lower) defectivity is acceptable for the product. Deposition lithography has been introduced in 3D NAND Flash to

  3. JSS project phase 4: Experimental and modelling studies of HLW glass dissolution in repository environments

    International Nuclear Information System (INIS)

    1987-10-01

    A goal of the JSS project was to develop a scientific basis for understanding the effects of waste package components, groundwater chemistry, and other repository conditions on glass dissolution behaviour, and to develop and refine a model for the processes governing glass dissolution. The fourth phase of the project, which was performed by the Hahn-Meitner-Institut, Berlin, FRG, dealt specifically with model development and application. Phase 4 also adressed whether basaltic glasses could serve as natural analogues for nuclear waste glasses, thus providing a means to test the capability of the model for long-term predictions. Additional experiments were performed in order to complete the data base necessary to model interactions between the glass and bentonite and between glass and steel corrosion products. More data on temperature, S/V, and pH dependence of the glass/water reaction were also collected. In this report, the data acquired during phase 4 are presented and discussed. (orig./DG)

  4. Incorporation of the KERN ECDS-PC software into a project oriented software environment

    International Nuclear Information System (INIS)

    Oren, W.; Pushor, R.; Ruland, R.

    1986-11-01

    The Stanford Linear Accelerator Center (SLAC) is in the process of building a new particle collider, the Stanford Linear Collider (SLC). The tunnel which houses the SLC is about 3 km long and contains approximately 1000 magnets. Besides a very precise absolute positioning of these magnets, the alignment of adjacent magnet ends is of particular importance to the success of the whole project. Because of this and the limited time frame, a survey method which was not only reliable and self-checking but also fast had to be developed. Therefore, the concept of MAS (Magnet Alignment System) was developed. This system utilizes the on-line data collection and the rigorous least-squares bundle adjustment of the KERN ECDS-PC system to fulfill these requirements. The ECDS software is embedded in a project tailored software system with modules which take care of: fixture and magnet calibration corrections, the calculation of ideal coordinates and their comparison to measured coordinates, the translation of detected misalignments into the coordinate system of the mechanical adjustments and the control of the adjustments with on-line electronic dial-gauges. This paper gives a brief introduction to the SLC project and some of the survey problems which are unique to this machine. The basic ideas of the KERN ECDS-PC system are explained and a discussion of the practical aspects, such as targeting and set-ups, are given. MAS and its modules are explained in detail

  5. Waste handling and storage in the decontamination pilot projects of JAEA for environments of Fukushima

    Energy Technology Data Exchange (ETDEWEB)

    Nakayama, S.; Kawase, K.; Iijima, K.; Kato, M. [Fukushima Environmental Safety Center, Headquarters of Fukushima Partnership Operations, Japan Atomic Energy Agency, Fukushima (Japan)

    2013-07-01

    After the Fukushima Daiichi nuclear accident, Japan Atomic Energy Agency (JAEA) was chosen by the national government to conduct decontamination pilot projects at selected sites in Fukushima prefecture. Despite tight boundary conditions in terms of timescale and resources, the projects served their primary purpose to develop a knowledge base to support more effective planning and implementation of stepwise regional remediation of the evacuated zone. A range of established, modified and newly developed techniques were tested under realistic field conditions and their performance characteristics were determined. The results of the project can be summarized in terms of site characterization, cleanup and waste management. A range of options were investigated to reduce the volumes of waste produced and to ensure that decontamination water could be cleaned to the extent that it could be discharged to normal drainage. Resultant solid wastes were packaged in standard flexible containers, labelled and stored at the remediation site (temporary storage until central interim storage becomes available). The designs of such temporary storage facilities were tailored to available sites, but all designs included measures to ensure mechanical stability (e.g., filling void spaces between containers with sand, graded cover with soil) and prevent releases to groundwater (impermeable base and cap, gravity flow drainage including radiation monitors and catch tanks). Storage site monitoring was also needed to check that storage structures would not be perturbed by external events that could include typhoons, heavy snowfalls, freeze/thaw cycles and earthquakes. (authors)

  6. ABrIL - Advanced Brain Imaging Lab : a cloud based computation environment for cooperative neuroimaging projects.

    Science.gov (United States)

    Neves Tafula, Sérgio M; Moreira da Silva, Nádia; Rozanski, Verena E; Silva Cunha, João Paulo

    2014-01-01

    Neuroscience is an increasingly multidisciplinary and highly cooperative field where neuroimaging plays an important role. Neuroimaging rapid evolution is demanding for a growing number of computing resources and skills that need to be put in place at every lab. Typically each group tries to setup their own servers and workstations to support their neuroimaging needs, having to learn from Operating System management to specific neuroscience software tools details before any results can be obtained from each setup. This setup and learning process is replicated in every lab, even if a strong collaboration among several groups is going on. In this paper we present a new cloud service model - Brain Imaging Application as a Service (BiAaaS) - and one of its implementation - Advanced Brain Imaging Lab (ABrIL) - in the form of an ubiquitous virtual desktop remote infrastructure that offers a set of neuroimaging computational services in an interactive neuroscientist-friendly graphical user interface (GUI). This remote desktop has been used for several multi-institution cooperative projects with different neuroscience objectives that already achieved important results, such as the contribution to a high impact paper published in the January issue of the Neuroimage journal. The ABrIL system has shown its applicability in several neuroscience projects with a relatively low-cost, promoting truly collaborative actions and speeding up project results and their clinical applicability.

  7. Conceptual Framework for the National Pilot Project on Livestock and the Environment, Livestock Series Report 2

    OpenAIRE

    Aziz Bouzaher; Stanley R. Johnson; Shannon Neibergs; Ron Jones; Larry Beran; Larry Frarey; Larry M. Hauck

    1993-01-01

    Assessing the effects of alternative policies that regulate nonpoint pollution from concentrated animal feeding operations (CAFOs) requires insight into the interactions of livestock production practices, waste management technologies, and their impacts on the environment. CAFOs have been identified as a source of nutrient loadings that impair ground and surface water quality, and they can emit intense odor that impairs air quality. This report describes the conceptual framework and the integ...

  8. ROMANIAâ€(tm)S FACTS ABOUT INTERNAL CONTROL ENVIRONMENT OF EUROPEAN SOCIAL FUND FINANCED PROJECTS

    OpenAIRE

    Danescu Tatiana; Dogar Cristian

    2012-01-01

    The malfunctioning of internal control system of European Social Fund (ESF) financed interventions may prejudice the sound financial management principle. Incorporating COSO principles in the beneficiaryâ€(tm)s internal control systems may provide some warranties about compliance to the above mentioned principle as described in the EC Regulation 1605-2002. This study aims to explore some facts in actual internal control environment, as a base for future improvements of Romanian ESF beneficiar...

  9. ROMANIA’S FACTS ABOUT INTERNAL CONTROL ENVIRONMENT OF EUROPEAN SOCIAL FUND FINANCED PROJECTS

    OpenAIRE

    Dogar Cristian; Dãnescu Tatiana

    2012-01-01

    The malfunctioning of internal control system of European Social Fund (ESF) financed interventions may prejudice the sound financial management principle. Incorporating COSO principles in the beneficiary’s internal control systems may provide some warranties about compliance to the above mentioned principle as described in the EC Regulation 1605-2002. This study aims to explore some facts in actual internal control environment, as a base for future improvements of Romanian ESF beneficiaryâ€...

  10. The EVNATURB project: toward an operational platform to assess Blue Green Solutions eco-systemic services in urban environment

    Science.gov (United States)

    Schertzer, D. J. M.; Versini, P. A.; Tchiguirinskaia, I.

    2017-12-01

    Urban areas are facing an expected increase in intensity and frequency of extreme weather events due to climate change. Combined with unsustainable urbanization, this should exacerbate the environmental consequences related to the water cycle as stormwater management issues, urban heat island increase and biodiversity degradation. Blue Green Solutions (BGS), such as green roofs, vegetated swales or urban ponds, appear to be particularly efficient to reduce the potential impact of new and existing urban developments with respect to these issues. Based on this statement, the French ANR EVNATURB project aims to develop a platform to assess the eco-systemic services provided by BGS and related with the previously mentioned issues. By proposing a multi-disciplinary consortium coupling monitoring, modelling and prospecting, it attempts to tackle several scientific issues currently limiting BGS wide implementation. Based on high resolution monitored sites and modelling tools, space-time variability of the related physical processes will be studied over a wide range of scales (from the material to the district scale), as well as local social-environmental stakes and constraints, to better consider the complexity of the urban environment. The EVNATURB platform developed during the project is intended for every stakeholder involved in urban development projects (planners, architects, engineering and environmental certification companies…) and will help them to implement BGS and evaluate which ones are the most appropriate for a particular project depending on its environmental objectives and constraints, and particularly for obtaining environmental certification.

  11. Evaluating high risks in large-scale projects using an extended VIKOR method under a fuzzy environment

    Directory of Open Access Journals (Sweden)

    S. Ebrahimnejad

    2012-04-01

    Full Text Available The complexity of large-scale projects has led to numerous risks in their life cycle. This paper presents a new risk evaluation approach in order to rank the high risks in large-scale projects and improve the performance of these projects. It is based on the fuzzy set theory that is an effective tool to handle uncertainty. It is also based on an extended VIKOR method that is one of the well-known multiple criteria decision-making (MCDM methods. The proposed decision-making approach integrates knowledge and experience acquired from professional experts, since they perform the risk identification and also the subjective judgments of the performance rating for high risks in terms of conflicting criteria, including probability, impact, quickness of reaction toward risk, event measure quantity and event capability criteria. The most notable difference of the proposed VIKOR method with its traditional version is just the use of fuzzy decision-matrix data to calculate the ranking index without the need to ask the experts. Finally, the proposed approach is illustrated with a real-case study in an Iranian power plant project, and the associated results are compared with two well-known decision-making methods under a fuzzy environment.

  12. The European project Trappist: transfer, processing and interpretation of 3D NDT data in a standard environment

    International Nuclear Information System (INIS)

    Georgel, B.; Nockemann, C.

    1994-01-01

    The European CEC-funded project TRAPPIST aims to provide the pre-requisites to combination of various NDT-methods. The key components to achieve this goal are a multi-method NDT standard data format and a platform-independent software environment. Another important feature is communication of both NDT data and expertise between remote workstations through state-of-the-art European ISDN broadband network. A full scale prototype is under development to demonstrate feasibility of this system. A survey on recent literature showing originality of the TRAPPIST features is included in the paper. (authors). 2 figs., 12 refs

  13. ESTIMA, a tool for EST management in a multi-project environment

    Directory of Open Access Journals (Sweden)

    Lewin Harris A

    2004-11-01

    Full Text Available Abstract Background Single-pass, partial sequencing of complementary DNA (cDNA libraries generates thousands of chromatograms that are processed into high quality expressed sequence tags (ESTs, and then assembled into contigs representative of putative genes. Usually, to be of value, ESTs and contigs must be associated with meaningful annotations, and made available to end-users. Results A web application, Expressed Sequence Tag Information Management and Annotation (ESTIMA, has been created to meet the EST annotation and data management requirements of multiple high-throughput EST sequencing projects. It is anchored on individual ESTs and organized around different properties of ESTs including chromatograms, base-calling quality scores, structure of assembled transcripts, and multiple sources of comparison to infer functional annotation, Gene Ontology associations, and cDNA library information. ESTIMA consists of a relational database schema and a set of interactive query interfaces. These are integrated with a suite of web-based tools that allow a user to query and retrieve information. Further, query results are interconnected among the various EST properties. ESTIMA has several unique features. Users may run their own EST processing pipeline, search against preferred reference genomes, and use any clustering and assembly algorithm. The ESTIMA database schema is very flexible and accepts output from any EST processing and assembly pipeline. ESTIMA has been used for the management of EST projects of many species, including honeybee (Apis mellifera, cattle (Bos taurus, songbird (Taeniopygia guttata, corn rootworm (Diabrotica vergifera, catfish (Ictalurus punctatus, Ictalurus furcatus, and apple (Malus x domestica. The entire resource may be downloaded and used as is, or readily adapted to fit the unique needs of other cDNA sequencing projects. Conclusions The scripts used to create the ESTIMA interface are freely available to academic users in

  14. ESTIMA, a tool for EST management in a multi-project environment.

    Science.gov (United States)

    Kumar, Charu G; LeDuc, Richard; Gong, George; Roinishivili, Levan; Lewin, Harris A; Liu, Lei

    2004-11-04

    Single-pass, partial sequencing of complementary DNA (cDNA) libraries generates thousands of chromatograms that are processed into high quality expressed sequence tags (ESTs), and then assembled into contigs representative of putative genes. Usually, to be of value, ESTs and contigs must be associated with meaningful annotations, and made available to end-users. A web application, Expressed Sequence Tag Information Management and Annotation (ESTIMA), has been created to meet the EST annotation and data management requirements of multiple high-throughput EST sequencing projects. It is anchored on individual ESTs and organized around different properties of ESTs including chromatograms, base-calling quality scores, structure of assembled transcripts, and multiple sources of comparison to infer functional annotation, Gene Ontology associations, and cDNA library information. ESTIMA consists of a relational database schema and a set of interactive query interfaces. These are integrated with a suite of web-based tools that allow a user to query and retrieve information. Further, query results are interconnected among the various EST properties. ESTIMA has several unique features. Users may run their own EST processing pipeline, search against preferred reference genomes, and use any clustering and assembly algorithm. The ESTIMA database schema is very flexible and accepts output from any EST processing and assembly pipeline. ESTIMA has been used for the management of EST projects of many species, including honeybee (Apis mellifera), cattle (Bos taurus), songbird (Taeniopygia guttata), corn rootworm (Diabrotica vergifera), catfish (Ictalurus punctatus, Ictalurus furcatus), and apple (Malus x domestica). The entire resource may be downloaded and used as is, or readily adapted to fit the unique needs of other cDNA sequencing projects. The scripts used to create the ESTIMA interface are freely available to academic users in an archived format from http

  15. The market for, and economics of, cogeneration and independent power projects in a competitive environment

    International Nuclear Information System (INIS)

    McLeese, R.

    1999-01-01

    A corporate review of Access Capital Corporation was presented. The company is a financial advisor for the development and ownership of electric power projects. The company has expertise in various technologies including gas-fired cogeneration, hydro energy, biomass, renewables and district heating. This presentation included a series of overhead viewgraphs which focused on: (1) the restructuring of Ontario's electricity market, (2) future private power requirements, (3) economics of IPP technologies, (4) pros and cons of on-site power generation, (5) rates paid for private power supply, and (6) financial restructuring of current NUG power purchase contracts. 2 tabs., 6 figs

  16. Project to support formation of an energy and environment technology demonstration project in fiscal 1999. International joint demonstration and research project (Sichuan Province natural gas DME project); 1999 nendo Shisensho tennen gas DME project seika hokokusho

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2000-03-01

    DME can be manufactured from such raw materials as natural gas, coal bed gas and coal. NKK who is developing a technology to synthesize efficiently the DME being a new energy has been commissioned from NEDO to investigate and study a project to manufacture DME using natural gas produced in Sinchuan Province, and utilize it as fuel for power generation, transportation and LPG substitution. In the present research, the DME manufacturing plant size was assumed to be 500 tons a day (165 x 10{sup 3} tons annually). This output nearly corresponds to the current LPG consumption. The required amount of natural gas as the raw material is 0.2 x 10{sup 9} Nm{sup 3}/year, wherein, since the total production quantity of natural gas in Sinchuan Province is 10 x 10{sup 9} Nm{sup 3}/year, there is no problem in the supply of natural gas as the raw material. The construction cost was estimated to be 11 billion yen taking into consideration the device fabrication cost and construction labor cost in China. Furthermore, as a result of discussing the economy considering the natural gas material cost, industrial water cost, and labor cost for plant operation, the internal profit rate for the total capital after tax was found a little over 10%, proving the project to have excellent economic performance. (NEDO)

  17. A Framework for Debugging Geoscience Projects in a High Performance Computing Environment

    Science.gov (United States)

    Baxter, C.; Matott, L.

    2012-12-01

    High performance computing (HPC) infrastructure has become ubiquitous in today's world with the emergence of commercial cloud computing and academic supercomputing centers. Teams of geoscientists, hydrologists and engineers can take advantage of this infrastructure to undertake large research projects - for example, linking one or more site-specific environmental models with soft computing algorithms, such as heuristic global search procedures, to perform parameter estimation and predictive uncertainty analysis, and/or design least-cost remediation systems. However, the size, complexity and distributed nature of these projects can make identifying failures in the associated numerical experiments using conventional ad-hoc approaches both time- consuming and ineffective. To address these problems a multi-tiered debugging framework has been developed. The framework allows for quickly isolating and remedying a number of potential experimental failures, including: failures in the HPC scheduler; bugs in the soft computing code; bugs in the modeling code; and permissions and access control errors. The utility of the framework is demonstrated via application to a series of over 200,000 numerical experiments involving a suite of 5 heuristic global search algorithms and 15 mathematical test functions serving as cheap analogues for the simulation-based optimization of pump-and-treat subsurface remediation systems.

  18. Collaborative Visualization Project: shared-technology learning environments for science learning

    Science.gov (United States)

    Pea, Roy D.; Gomez, Louis M.

    1993-01-01

    Project-enhanced science learning (PESL) provides students with opportunities for `cognitive apprenticeships' in authentic scientific inquiry using computers for data-collection and analysis. Student teams work on projects with teacher guidance to develop and apply their understanding of science concepts and skills. We are applying advanced computing and communications technologies to augment and transform PESL at-a-distance (beyond the boundaries of the individual school), which is limited today to asynchronous, text-only networking and unsuitable for collaborative science learning involving shared access to multimedia resources such as data, graphs, tables, pictures, and audio-video communication. Our work creates user technology (a Collaborative Science Workbench providing PESL design support and shared synchronous document views, program, and data access; a Science Learning Resource Directory for easy access to resources including two-way video links to collaborators, mentors, museum exhibits, media-rich resources such as scientific visualization graphics), and refine enabling technologies (audiovisual and shared-data telephony, networking) for this PESL niche. We characterize participation scenarios for using these resources and we discuss national networked access to science education expertise.

  19. 129I, 60Co, and 106Ru measurements on water samples from the Hanford project environs

    International Nuclear Information System (INIS)

    Brauer, F.P.; Rieck, H.G. Jr.

    1973-01-01

    Groundwater flow and contamination patterns beneath the Hanford project reservation have been studied since the early days of the project. The measurement of radioactive materials at concentrations much below those required for radiation protection are useful for tracing groundwater movement and detection of potential contamination problems before they are apt to occur. Groundwater samples from a number of wells on or near the Hanford reservation have been analyzed for 129 I by neutron activation analysis and for gamma radioactivity by low-level coincidence gamma-ray spectrometry. The major radionuclides in addition to natural radioactivity detected in the underground waters by gamma-ray spectrometry were 106 Ru and 60 Co. Local river and rain water samples were also analyzed for 129 I and long-lived radionuclides. Special sample collection methods were developed to prevent contamination of the water samples during collection. Anions travel farther than cations in underground water systems since soils are primarily cation exchangers and retain the cations. Anion exchange techniques were used in the field and the laboratory to recover the desired radionuclides. Sample sizes ranged up to several thousand liters. This paper discusses the sample collection methods,analysis methods, and results obtained. The methods used were found to provide high sensitivity for groundwater studies. (auth)

  20. Closed-looped in situ nano processing on a culturing cell using an inverted electron beam lithography system

    International Nuclear Information System (INIS)

    Hoshino, Takayuki; Mabuchi, Kunihiko

    2013-01-01

    Highlights: ► An electron beam lithography (EBL) was used as an in situ nano processing for a living cell. ► A synchronized optics was containing an inverted EBL and an optical microscope. ► This system visualized real-time images of the EB-induced nano processing. ► We demonstrated the nano processing for a culturing cell with 200–300 nm resolution. ► Our system would be able to provide high resolution display of virtual environments. -- Abstract: The beam profile of an electron beam (EB) can be focused onto less than a nanometer spot and scanned over a wide field with extremely high speed sweeping. Thus, EB is employed for nano scale lithography in applied physics research studies and in fabrication of semiconductors. We applied a scanning EB as a control system for a living cell membrane which is representative of large scale complex systems containing nanometer size components. First, we designed the opposed co-axial dual optics containing inverted electron beam lithography (I-EBL) system and a fluorescent optical microscope. This system could provide in situ nano processing for a culturing living cell on a 100-nm-thick SiN nanomembrane, which was placed between the I-EBL and the fluorescent optical microscope. Then we demonstrated the EB-induced chemical direct nano processing for a culturing cell with hundreds of nanometer resolution and visualized real-time images of the scanning spot of the EB-induced luminescent emission and chemical processing using a high sensitive camera mounted on the optical microscope. We concluded that our closed-loop in situ nano processing would be able to provide a nanometer resolution display of virtual molecule environments to study functional changes of bio-molecule systems

  1. Estimates of oil entering the marine environment in the past decade : GESAMP Working Group 32 project

    International Nuclear Information System (INIS)

    Etkin, D.S.; Grey, C.; Wells, P.; Koefoed, J.; Nauke, M.; Meyer, T.; Campbell, J.; Reddy, S.

    1998-01-01

    A meeting of the Joint Group of Experts on the Scientific Aspects of Marine Protection (GESAMP), Working Group 32, was held to discuss a new approach for evaluating available data sources on the input of oil into the marine environment from sea-based activities. GESAMP Working Group on Estimates of Oil Entering the Marine Environment, Sea Based Activities (Working Group 32) will collect and analyze data on oil inputs over the last decade from shipping, offshore and coastal exploration and production, pipelines, atmospheric emissions from sea-based activities, coastal refineries and storage facilities, oil reception facilities, materials disposed of at sea, and natural seepage. The group will compare its oil input estimate model to estimates made by the National Research Council, the International Maritime Organization (IMO), and GESAMP in previous decades, to evaluate the efficacy of IMO conventions and other pollution reduction efforts in the last 10 years. The group will also consider the amounts of oil entering the sea through operational and accidental spillage in relation to the quantities of oil transported by ship and through pipelines, and in relation to offshore and coastal oil production. 7 refs., 4 tabs

  2. Projectables

    DEFF Research Database (Denmark)

    Rasmussen, Troels A.; Merritt, Timothy R.

    2017-01-01

    CNC cutting machines have become essential tools for designers and architects enabling rapid prototyping, model-building and production of high quality components. Designers often cut from new materials, discarding the irregularly shaped remains. We introduce ProjecTables, a visual augmented...... reality system for interactive packing of model parts onto sheet materials. ProjecTables enables designers to (re)use scrap materials for CNC cutting that would have been previously thrown away, at the same time supporting aesthetic choices related to wood grain, avoiding surface blemishes, and other...... relevant material properties. We conducted evaluations of ProjecTables with design students from Aarhus School of Architecture, demonstrating that participants could quickly and easily place and orient model parts reducing material waste. Contextual interviews and ideation sessions led to a deeper...

  3. Final report on the project research 'assessment of radiation exposure of the public to radioactivities related to the environment and food chain'. April 1988 - March 1992

    International Nuclear Information System (INIS)

    1994-03-01

    This publication is the collection of the reports on the project research 'Assessment of Radiation Exposure of the Public to Radioactivities Related to the Environment and Food Chain'. The 16 of the reports are indexed individually. (J.P.N.)

  4. An Authentic Learning Environment Based on Video Project among Arabic Learners

    Directory of Open Access Journals (Sweden)

    Azman Che Mat

    2017-05-01

    Full Text Available Role playing is among the language activities that stimulate language learners to use the language they are learning. However, a successful activity is always challenging especially when the learners are beginners. Therefore, a special arrangement needs to be carried out by instructors. This article explores the use of storyboards, or ‘PCVA’, to help Arabic learners prepare for their video project based on role playing. Blended methods were used to collect data, namely surveys, interviews, and observations. The target participants were among degree students from second level (TAC451 and third level (TAC501 of Arabic course. The total number of the participants is 87 respondents. Interview and observation were conducted during consultation period and then, related information was documented for the purpose of the study. Descriptive analysis was implemented to interpret the data. The findings showed a positive feedback from the learners who were involved in the experiment.

  5. The new Algerian law project about hydrocarbons: Sonatrach reinforced in a competitive environment

    International Nuclear Information System (INIS)

    Mebtoul, A.

    2002-01-01

    At the time of the transposition of the first gas directive in French law and of the start up of a new phase of the liberalization of the natural gas market in the European Union, it is useful to have an idea of the opinion of the supplying countries in this domain. In the coming years, the gas dependence of the European Union with respect to the producing countries will increase. Thus, the relations with these countries will change progressively with the new context defined by the second directive. Among the gas producing countries, Algeria is a close and faithful partner of France and Europe. The expected evolutions of its hydrocarbons sector show its adaptation will to the competitive context and its wish of partnership reinforcement with European gas companies. This article presents an analysis of the Algerian project of hydrocarbons law made by an Algerian expert of this sector. (J.S.)

  6. Reflections on Students’ Projects with Motion Sensor Technologies in a Problem-Based Learning Environment

    DEFF Research Database (Denmark)

    Triantafyllou, Eva; Timcenko, Olga; Triantafyllidis, George

    2014-01-01

    Game-based learning (GBL) has been applied in many fields to enhance learning motivations. In recent years, motion sensor technologies have been also introduced in GBL with the aim of using active, physical modalities to facilitate the learning process, while fostering social development...... and collaboration (when these activities involve more than one student at a time). The approaches described in literature, which used motion sensors in GBL, cover a broad spectrum of educational fields. These approaches investigated the effect of learning games using motion sensors on the development of specific...... skills or on the learning experience. This paper presents our experiences on the educational use of motion sensor technologies. Our research was conducted at the department of Medialogy in Aalborg University Copenhagen. Aalborg University applies a problem-based, project-organized model of teaching...

  7. Speciation Analysis of Radionuclides in the Environment - NSK-B SPECIATION project report 2009

    DEFF Research Database (Denmark)

    Hou, Xiaolin; Aldahan, Ala; Possnert, Göran

    . Speciation of radionuclides in soils and sediments includes: Sequential extraction of radionuclides in sediments and of trace elements in soil samples. Sequential extraction of radionuclides in aerosols and particles has also been performed. Further-more, sorption experiments have been performed......, sediments, particles); and (3) Intercomparison excise for speciation analysis of radionu-clides in soil and sediment. This report summarizes the work completed in the project partners’ laboratories, Method developments include: Development of an rapid and in-suit separation method for the speciation...... analysis of 129I in seawater samples; Development of a simple method for the speciation analysis of 129I in fresh water and seawater samples; Development of an on-line HPLC-ICP-MS method for the direct speciation analysis of 127I in water and leachate samples; Speciation of radionuclides in water includes...

  8. UniFlex A WWW-environment for project-based collaborative learning

    DEFF Research Database (Denmark)

    Borch, Ole; Helbo, Jan; Knudsen, Morten

    2003-01-01

    technical maintenance. Web interfaces for all type of users are developed to ease information and document upload, user administration and more. The product is used at Aalborg University open distance education for "Master of Industrial Information technology" (MII) and "Master in Mobile Information......Increasing demands for remote on-line education are changing the way teaching and learning is performed. New behavior in using pedagogy and supporting technology is needed to drive the learning process. To facilitate the use of services for selected activities to participants in on-line education......, a web site named UniFlex (University Flexible learning) has been developed and brought into use. The site is a comprehensive set of bookmarks including course taking, upload/download, and - of special significance - collaborative on-line project work. UniFlex has been developed to meet the requirement...

  9. Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

    Directory of Open Access Journals (Sweden)

    Cian Cummins

    2017-09-01

    Full Text Available The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examine the status of recent efforts to develop active device elements using nontraditional lithography in this article, with a specific focus on block copolymer (BCP feature patterning. An elegant route is demonstrated using directed self-assembly (DSA of BCPs for the fabrication of aligned tungsten trioxide (WO3 nanowires towards nanoelectronic device application. The strategy described avoids conventional lithography practices such as optical patterning as well as repeated etching and deposition protocols and opens up a new approach for device development. Nanoimprint lithography (NIL silsesquioxane (SSQ-based trenches were utilized in order to align a cylinder forming poly(styrene-block-poly(4-vinylpyridine (PS-b-P4VP BCP soft template. We outline WO3 nanowire fabrication using a spin-on process and the symmetric current-voltage characteristics of the resulting Ti/Au (5 nm/45 nm contacted WO3 nanowires. The results highlight the simplicity of a solution-based approach that allows creating active device elements and controlling the chemistry of specific self-assembling building blocks. The process enables one to dictate nanoscale chemistry with an unprecedented level of sophistication, forging the way for next-generation nanoelectronic devices. We lastly outline views and future research studies towards improving the current platform to achieve the desired device performance.

  10. Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

    Science.gov (United States)

    Cummins, Cian; Bell, Alan P; Morris, Michael A

    2017-09-30

    The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examine the status of recent efforts to develop active device elements using nontraditional lithography in this article, with a specific focus on block copolymer (BCP) feature patterning. An elegant route is demonstrated using directed self-assembly (DSA) of BCPs for the fabrication of aligned tungsten trioxide (WO₃) nanowires towards nanoelectronic device application. The strategy described avoids conventional lithography practices such as optical patterning as well as repeated etching and deposition protocols and opens up a new approach for device development. Nanoimprint lithography (NIL) silsesquioxane (SSQ)-based trenches were utilized in order to align a cylinder forming poly(styrene)- block -poly(4-vinylpyridine) (PS- b -P4VP) BCP soft template. We outline WO₃ nanowire fabrication using a spin-on process and the symmetric current-voltage characteristics of the resulting Ti/Au (5 nm/45 nm) contacted WO₃ nanowires. The results highlight the simplicity of a solution-based approach that allows creating active device elements and controlling the chemistry of specific self-assembling building blocks. The process enables one to dictate nanoscale chemistry with an unprecedented level of sophistication, forging the way for next-generation nanoelectronic devices. We lastly outline views and future research studies towards improving the current platform to achieve the desired device performance.

  11. Imbalance aware lithography hotspot detection: a deep learning approach

    Science.gov (United States)

    Yang, Haoyu; Luo, Luyang; Su, Jing; Lin, Chenxi; Yu, Bei

    2017-07-01

    With the advancement of very large scale integrated circuits (VLSI) technology nodes, lithographic hotspots become a serious problem that affects manufacture yield. Lithography hotspot detection at the post-OPC stage is imperative to check potential circuit failures when transferring designed patterns onto silicon wafers. Although conventional lithography hotspot detection methods, such as machine learning, have gained satisfactory performance, with the extreme scaling of transistor feature size and layout patterns growing in complexity, conventional methodologies may suffer from performance degradation. For example, manual or ad hoc feature extraction in a machine learning framework may lose important information when predicting potential errors in ultra-large-scale integrated circuit masks. We present a deep convolutional neural network (CNN) that targets representative feature learning in lithography hotspot detection. We carefully analyze the impact and effectiveness of different CNN hyperparameters, through which a hotspot-detection-oriented neural network model is established. Because hotspot patterns are always in the minority in VLSI mask design, the training dataset is highly imbalanced. In this situation, a neural network is no longer reliable, because a trained model with high classification accuracy may still suffer from a high number of false negative results (missing hotspots), which is fatal in hotspot detection problems. To address the imbalance problem, we further apply hotspot upsampling and random-mirror flipping before training the network. Experimental results show that our proposed neural network model achieves comparable or better performance on the ICCAD 2012 contest benchmark compared to state-of-the-art hotspot detectors based on deep or representative machine leaning.

  12. Inspection of imprint lithography patterns for semiconductor and patterned media

    Science.gov (United States)

    Resnick, Douglas J.; Haase, Gaddi; Singh, Lovejeet; Curran, David; Schmid, Gerard M.; Luo, Kang; Brooks, Cindy; Selinidis, Kosta; Fretwell, John; Sreenivasan, S. V.

    2010-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Acceptance of imprint lithography for manufacturing will require demonstration that it can attain defect levels commensurate with the requirements of cost-effective device production. This work summarizes the results of defect inspections of semiconductor masks, wafers and hard disks patterned using Jet and Flash Imprint Lithography (J-FILTM). Inspections were performed with optical and e-beam based automated inspection tools. For the semiconductor market, a test mask was designed which included dense features (with half pitches ranging between 32 nm and 48 nm) containing an extensive array of programmed defects. For this work, both e-beam inspection and optical inspection were used to detect both random defects and the programmed defects. Analytical SEMs were then used to review the defects detected by the inspection. Defect trends over the course of many wafers were observed with another test mask using a KLA-T 2132 optical inspection tool. The primary source of defects over 2000 imprints were particle related. For the hard drive market, it is important to understand the defectivity of both the template and the imprinted disk. This work presents a methodology for automated pattern inspection and defect classification for imprint-patterned media. Candela CS20 and 6120 tools from KLA-Tencor map the optical properties of the disk surface, producing highresolution grayscale images of surface reflectivity, scattered light, phase shift, etc. Defects that have been identified in this manner are further characterized according to the morphology

  13. Durable diamond-like carbon templates for UV nanoimprint lithography

    International Nuclear Information System (INIS)

    Tao, L; Ramachandran, S; Nelson, C T; Overzet, L J; Goeckner, M; Lee, G; Hu, W; Lin, M; Willson, C G; Wu, W

    2008-01-01

    The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40 nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography

  14. Subwavelength optical lithography via classical light: A possible implementation

    Science.gov (United States)

    You, Jieyu; Liao, Zeyang; Hemmer, P. R.; Zubairy, M. Suhail

    2018-04-01

    The resolution of an interferometric optical lithography system is about the half wavelength of the illumination light. We proposed a method based on Doppleron resonance to achieve a resolution beyond half wavelength [Phys. Rev. Lett. 96, 163603 (2006), 10.1103/PhysRevLett.96.163603]. Here, we analyze a possible experimental demonstration of this method in the negatively charged silicon-vacancy (SiV-) system by considering realistic experimental parameters. Our results show that quarter wavelength resolution and beyond can be achieved in this system even in room temperature without using perturbation theory.

  15. Application status and prospect of X-ray lithography technology

    International Nuclear Information System (INIS)

    Xie Changqing; Chen Dapeng; Liu Ming; Ye Tianchun; Yi Futing

    2004-01-01

    Because of its many merits, such as high resolution, large depth of focus, large field size, high throughput, large process latitude, easy extendibility to 50 nm and below ground rule, and so on, the Proximity X-ray Lithography (PXL) is very attractive for the 100 nm and smaller ground rule integrated circuit manufacturing. In this paper, the international research and development status of PXL is briefly introduced firstly, and both its application status and prospect in nanoelectronics research, Monolithic Microwave Integrated Circuits (MMIC) production and silicon-based Ultra Large Scale Integrated Circuits (ULSIC) production are described, and the recent research progress in home PXL is also presented briefly. (authors)

  16. Multichannel silicon WDM ring filters fabricated with DUV lithography

    Science.gov (United States)

    Lee, Jong-Moo; Park, Sahnggi; Kim, Gyungock

    2008-09-01

    We have fabricated 9-channel silicon wavelength-division-multiplexing (WDM) ring filters using 193 nm deep-ultraviolet (DUV) lithography and investigated the spectral properties of the ring filters by comparing the transmission spectra with and without an upper cladding. The average channel-spacing of the 9-channel WDM ring filter with a polymeric upper cladding is measured about 1.86 nm with the standard deviation of the channel-spacing about 0.34 nm. The channel crosstalk is about -30 dB, and the minimal drop loss is about 2 dB.

  17. Masks for high aspect ratio x-ray lithography

    International Nuclear Information System (INIS)

    Malek, C.K.; Jackson, K.H.; Bonivert, W.D.; Hruby, J.

    1997-01-01

    Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding

  18. Shadow edge lithography for nanoscale patterning and manufacturing

    International Nuclear Information System (INIS)

    Bai, John G; Chang, C-L; Chung, Jae-Hyun; Lee, Kyong-Hoon

    2007-01-01

    We demonstrate a wafer-scale nanofabrication method using the shadow effect in physical vapor deposition. An analytical model is presented to predict the formation of nanoscale gaps created by the shadow effect of a prepatterned edge on a deposition plane. The theoretical prediction agrees quantitatively with the widths of the fabricated nanogaps and nanochannels. In the diffusion experiments, both λ-DNA and fluorescein molecules were successfully introduced into the nanochannels. The proposed shadow edge lithography has potential to be a candidate for mass-producing nanostructures

  19. Wavelength selection for multilayer coatings for the lithography generation beyond extreme ultraviolet

    NARCIS (Netherlands)

    Makhotkin, Igor Alexandrovich; Zoethout, E.; Louis, Eric; Yakunin, A.M.; Muellender, S.; Bijkerk, Frederik

    2012-01-01

    Reducing the operating wavelength in advanced photolitho- graphy while maintaining the lithography machine’s produc- tivity has been a traditional way to enable improved imaging for the last 20 years. The transition from 13.5 nm to 6.5 to 6.9 nm optical lithography offers a possibility to combine

  20. Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography

    NARCIS (Netherlands)

    Khan, M.U.; Justice, J.; Petäjä, J.; Korhonen, T.; Boersma, A.; Wiegersma, S.; Karppinen, M.; Corbett, B.

    2015-01-01

    Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index

  1. Grassroots projects aimed at the built environment: Association with neighbourhood deprivation, land-use mix and injury risk to road users.

    Science.gov (United States)

    Dubé, Anne Sophie; Beausoleil, Maude; Gosselin, Céline; Beaulme, Ginette; Paquin, Sophie; Pelletier, Anne; Goudreau, Sophie; Poirier, Marie-Hélène; Drouin, Louis; Gauvin, Lise

    2014-07-09

    1) To describe grassroots projects aimed at the built environment and associated with active transportation on the Island of Montreal; and 2) to examine associations between the number of projects and indicators of neighbourhood material and social deprivation and the built environment. We identified funding agencies and community groups conducting projects on built environments throughout the Island of Montreal. Through website consultation and a snowballing procedure, we inventoried projects that aimed at transforming built environments and that were carried out by community organizations between January 1, 2006, and November 1, 2010. We coded and validated information about project activities and created an interactive map using Geoclip software. Correlational analyses quantified associations between number of projects, neighbourhood characteristics and deprivation. A total of 134 community organizations were identified, and 183 grassroots projects were inventoried. A large number of projects were aimed at increasing awareness of/improving active or public transportation (n=95), improving road safety (n=84) and enhancing neighbourhood beautification and greening (n=69). The correlation between the presence of projects and the extent of neighbourhood material deprivation was small (Kendall's t=0.26, p<0.001), but in areas with greater social deprivation there were more projects (Kendall's t=0.38, p<0.001). Larger numbers of projects were also associated with the presence of more extensive land-use mix (Kendall's t=0.23, p<0.001) and a greater proportion of road intersections with injured pedestrians, cyclists and motor vehicle users (Kendall's t=0.43, p<0.001). There is significant community mobilization around built environments and active transportation. Investigations of the implementation processes and impacts are warranted.

  2. ROMANIA’S FACTS ABOUT INTERNAL CONTROL ENVIRONMENT OF EUROPEAN SOCIAL FUND FINANCED PROJECTS

    Directory of Open Access Journals (Sweden)

    Dogar Cristian

    2012-07-01

    Full Text Available The malfunctioning of internal control system of European Social Fund (ESF financed interventions may prejudice the sound financial management principle. Incorporating COSO principles in the beneficiary’s internal control systems may provide some warranties about compliance to the above mentioned principle as described in the EC Regulation 1605-2002. This study aims to explore some facts in actual internal control environment, as a base for future improvements of Romanian ESF beneficiary’s internal control systems ESF financed interventions covers a large range of costs for implementing labor market related services. But supporting costs according to the sound financial management principle calls for best value for money in real and legal operations. Without some specifics from the donor or a mutual accepted best practice model, most of the ESF beneficiaries are reporting their efforts to actual researches and specialized literature regarding internal control system implementation in services. This study was realized in April 2012 by applying an investigation instrument, an on-line questionnaire collecting both opinions and factual data as well to a number of 962 members of a practice community for ESF interventions implementation. This technique was used to test hypotheses regarding the premises existence for a future improvement of the existing internal control system model. 100 members of this community: managers, accountants, auditors financial responsible and other team members answered anonymously, revealing a real concern for internal control, providing as well a different side image for this. Analyzing all stakeholder answers, we may consider that our hypothesis is correct and there is a real need for internal control environment improvements. This study is a part of a larger research “New models of the accounting and internal control systems of ESF financed interventions in Romania”, addressing a qualitative

  3. The Effects of Project APPLE (Autistic Preadolescent Proactive Learning Environments) on Academic, Behavioral, and Transitional Needs of Students with Autism Spectrum Disorder

    Science.gov (United States)

    Cayce, Robin M.

    2012-01-01

    This study addressed the effects of Project APPLE, an intervention created by the researcher and supported by the Guide to Project APPLE, a handbook which provided research-based teaching strategies, modificaitons to the learning environment, and transitional supports for students with ASD, and the teachers with whom their care and education is…

  4. How do we help students as newcomers to create and develop better communities of practice for learning in a Project based learning environment?

    DEFF Research Database (Denmark)

    Jensen, Lars Peter

    2007-01-01

    The question for debate in this paper, is how to help students creating and developing good communities of practice for learning in a Project based learning environment? At Aalborg University it has proven very helpful for students to have both a course addressing communication, collaboration......, learning and project management (CLP) and a reflection on these issues in a written process analysis....

  5. NASA/DOD Aerospace Knowledge Diffusion Research Project. Paper 48: Valuing information in an interactive environment

    Science.gov (United States)

    Brinberg, Herbert R.; Pinelli, Thomas E.; Barclay, Rebecca O.

    1995-01-01

    Consideration effort has been devoted over the past 30 years to developing methods and means of assessing the value of information. Two approaches - value in exchange and value in use - dominate; however, neither approach enjoys much practical application because validation schema for decision-making is missing. The approaches fail to measure objectively the real costs of acquiring information and the real benefits that information will yield. Moreover, these approaches collectively fail to provide economic justification to build and/or continue to support an information product or service. In addition, the impact of Cyberspace adds a new dimension to the problem. A new paradigm is required to make economic sense in this revolutionary information environment. In previous work, the authors explored the various approaches to measuring the value of information and concluded that, in large measure, these methods were unworkable concepts and constructs. Instead, they proposed several axioms for valuing information. Most particularly they concluded that the 'value of information cannot be measured in the absence of a specific task, objective, or goal.' This paper builds on those axioms and describes under which circumstances information can be measured in objective and actionable terms. This paper also proposes a methodology for undertaking such measures and validating the results.

  6. Business process projection in relation to the internationalization of the external environment of industrial companies

    Directory of Open Access Journals (Sweden)

    Váchal Jan

    2017-01-01

    Full Text Available Highly intensive internalization of the world economy requires the business sector to have different view of strategic management and decision making, together with the quality and content of business processes. Changes in the environment of enterprises significantly influence their function and behaviour, causing a need to significantly change enterprise architecture, including the design of development strategies. The paper focuses on analysing the processes of industrial enterprises, dealing with their importance and profit, classified by size. The result revealed that process activities, such as input logistics and marketing, are dominant in micro-enterprises, and such activities are important in profitable enterprises. In middle-sized enterprises, there is a more significant difference between marketing/sales and services without any relations to profit. However, there is a requirement to intensify these activities in non-profitable enterprises. Large enterprises revealed a significant influence of the scientific and technological development and also, to a lesser extent, of marketing, sales and purchase. Non-profitable enterprises should also focus on improving the quality of such processes.

  7. Impact of urban heat island on cooling and environment: A demonstration project

    International Nuclear Information System (INIS)

    1993-04-01

    Landscaping has been shown in simulation and field studies to reduce building cooling loads by affecting microclimatic factors such as solar radiation, wind speed and air temperature. A demonstration project was undertaken to determine the magnitude of landscape induced changes in microclimate on building cooling loads and water use on four typical residences in Phoenix, Arizona. The energy use and microclimate of three unlandscaped (bare soil, rock mulch) and one landscaped (turf) home were monitored during summer 1990. In the fall, turf was placed around one of the unlandscaped houses, and shade trees planted on the west and south sides of another. Measurements continued during the summer of 1991. Total house air conditioning and selected appliance electrical data were collected, as well as inside and outside air temperatures. Detailed microclimate measurements were obtained for one to two week periods during both summers. Maximum reductions of hourly outside air temperatures of 1 to 1.5 degrees C, and of daily average air temperatures of up to 1 degrees C, resulted from the addition of turf landscaping. Addition of small trees to the south and west sides of another treatment did not have a noticeable effect on air temperature. Cooling load reductions of 10% to 17% were observed between years when well-watered turf landscaping was added to a house previously surrounded by bare soil. Addition of small trees to another bare landscape did not produce a detectable change in cooling load. The results of the study are used as input to a standard building energy use simulation model to predict landscape effects on cooling load and water usage for three typical houses, and to develop guidelines for use of energy efficient residential landscapes in Phoenix, Arizona

  8. Computer numerical control (CNC) lithography: light-motion synchronized UV-LED lithography for 3D microfabrication

    International Nuclear Information System (INIS)

    Kim, Jungkwun; Allen, Mark G; Yoon, Yong-Kyu

    2016-01-01

    This paper presents a computer-numerical-controlled ultraviolet light-emitting diode (CNC UV-LED) lithography scheme for three-dimensional (3D) microfabrication. The CNC lithography scheme utilizes sequential multi-angled UV light exposures along with a synchronized switchable UV light source to create arbitrary 3D light traces, which are transferred into the photosensitive resist. The system comprises a switchable, movable UV-LED array as a light source, a motorized tilt-rotational sample holder, and a computer-control unit. System operation is such that the tilt-rotational sample holder moves in a pre-programmed routine, and the UV-LED is illuminated only at desired positions of the sample holder during the desired time period, enabling the formation of complex 3D microstructures. This facilitates easy fabrication of complex 3D structures, which otherwise would have required multiple manual exposure steps as in the previous multidirectional 3D UV lithography approach. Since it is batch processed, processing time is far less than that of the 3D printing approach at the expense of some reduction in the degree of achievable 3D structure complexity. In order to produce uniform light intensity from the arrayed LED light source, the UV-LED array stage has been kept rotating during exposure. UV-LED 3D fabrication capability was demonstrated through a plurality of complex structures such as V-shaped micropillars, micropanels, a micro-‘hi’ structure, a micro-‘cat’s claw,’ a micro-‘horn,’ a micro-‘calla lily,’ a micro-‘cowboy’s hat,’ and a micro-‘table napkin’ array. (paper)

  9. The hELENa project - I. Stellar populations of early-type galaxies linked with local environment and galaxy mass

    Science.gov (United States)

    Sybilska, A.; Lisker, T.; Kuntschner, H.; Vazdekis, A.; van de Ven, G.; Peletier, R.; Falcón-Barroso, J.; Vijayaraghavan, R.; Janz, J.

    2017-09-01

    We present the first in a series of papers in The role of Environment in shaping Low-mass Early-type Nearby galaxies (hELENa) project. In this paper, we combine our sample of 20 low-mass early types (dEs) with 258 massive early types (ETGs) from the ATLAS3D survey - all observed with the SAURON integral field unit - to investigate early-type galaxies' stellar population scaling relations and the dependence of the population properties on local environment, extended to the low-σ regime of dEs. The ages in our sample show more scatter at lower σ values, indicative of less massive galaxies being affected by the environment to a higher degree. The shape of the age-σ relations for cluster versus non-cluster galaxies suggests that cluster environment speeds up the placing of galaxies on the red sequence. While the scaling relations are tighter for cluster than for the field/group objects, we find no evidence for a difference in average population characteristics of the two samples. We investigate the properties of our sample in the Virgo cluster as a function of number density (rather than simple clustrocentric distance) and find that dE ages correlate with the local density such that galaxies in regions of lower density are younger, likely because they are later arrivals to the cluster or have experienced less pre-processing in groups, and consequently used up their gas reservoir more recently. Overall, dE properties correlate more strongly with density than those of massive ETGs, which was expected as less massive galaxies are more susceptible to external influences.

  10. [A new age of mass casuality education? : The InSitu project: realistic training in virtual reality environments].

    Science.gov (United States)

    Lorenz, D; Armbruster, W; Vogelgesang, C; Hoffmann, H; Pattar, A; Schmidt, D; Volk, T; Kubulus, D

    2016-09-01

    Chief emergency physicians are regarded as an important element in the care of the injured and sick following mass casualty accidents. Their education is very theoretical; practical content in contrast often falls short. Limitations are usually the very high costs of realistic (large-scale) exercises, poor reproducibility of the scenarios, and poor corresponding results. To substantially improve the educational level because of the complexity of mass casualty accidents, modified training concepts are required that teach the not only the theoretical but above all the practical skills considerably more intensively than at present. Modern training concepts should make it possible for the learner to realistically simulate decision processes. This article examines how interactive virtual environments are applicable for the education of emergency personnel and how they could be designed. Virtual simulation and training environments offer the possibility of simulating complex situations in an adequately realistic manner. The so-called virtual reality (VR) used in this context is an interface technology that enables free interaction in addition to a stereoscopic and spatial representation of virtual large-scale emergencies in a virtual environment. Variables in scenarios such as the weather, the number wounded, and the availability of resources, can be changed at any time. The trainees are able to practice the procedures in many virtual accident scenes and act them out repeatedly, thereby testing the different variants. With the aid of the "InSitu" project, it is possible to train in a virtual reality with realistically reproduced accident situations. These integrated, interactive training environments can depict very complex situations on a scale of 1:1. Because of the highly developed interactivity, the trainees can feel as if they are a direct part of the accident scene and therefore identify much more with the virtual world than is possible with desktop systems

  11. A Critical Evaluation of Ground-Penetrating Radar Methodology on the Kalavasos and Maroni Built Environments (KAMBE) Project, Cyprus (Invited)

    Science.gov (United States)

    Leon, J.; Urban, T.; Gerard-Little, P.; Kearns, C.; Manning, S. W.; Fisher, K.; Rogers, M.

    2013-12-01

    The Kalavasos and Maroni Built Environments (KAMBE) Project is a multi-year investigation of the urban fabric and architectural organization of two Late Bronze Age (c. 1650-1100 BCE) polities on Cyprus. The Late Bronze Age (known also as the Late Cypriot period on Cyprus) is characterized by the emergence of a number of large, urban settlements on the island. The amalgamation of large populations at centralized sites coincides with contemporary social, economic and political changes, including a growing disparity in funerary goods, an increased emphasis on metallurgy (specifically copper mining and smelting for the production of bronze), and the construction of monumental buildings. The initial phase of the project centered on geophysical survey at two archaeological sites in adjacent river valleys in south-central Cyprus: Kalavasos-Ayios Dhimitrios and the Maroni settlement cluster [1]. These sites are thought to be two of the earliest 'urban' settlements on the island and provide a unique opportunity to explore how urban space was instrumental in the development of social and political complexity during this transformative period. The formation of these Late Bronze Age urban landscapes is, we argue, not simply the result of this emerging social complexity, but is instead an key tool in the creation and maintenance of societal boundaries. Indeed, the process of 'place-making'--the dynamic creation of socially meaningful spaces, likely by elites--may well have been one of the most effective arenas that elites used to re-enforce the growing socio-political disparity. The KAMBE Project investigates the layout and organization of these new 'urban' spaces to better understand how built-space impacted social developments. Geophysical survey methods are ideal for large-scale data collection both to identify potential areas for targeted archaeological excavation, and to provide proxy data for architectural plans that allow us to comment on the nature of the urban fabric

  12. Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial.

    Science.gov (United States)

    Chen, Xi; Zhang, Cheng; Yang, Fan; Liang, Gaofeng; Li, Qiaochu; Guo, L Jay

    2017-10-24

    In this work, a special hyperbolic metamaterial (HMM) metamaterial is investigated for plasmonic lithography of period reduction patterns. It is a type II HMM (ϵ ∥ 0) whose tangential component of the permittivity ϵ ∥ is close to zero. Due to the high anisotropy of the type II epsilon-near-zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. This work takes the advantage of a type II ENZ HMM composed of aluminum/aluminum oxide films and the associated unusual mode to expose a photoresist layer in a specially designed lithography system. Periodic patterns with a half pitch of 58.3 nm were achieved due to the interference of third-order diffracted light of the grating. The lines were 1/6 of the mask with a period of 700 nm and ∼1/7 of the wavelength of the incident light. Moreover, the theoretical analyses performed are widely applicable to structures made of different materials such as silver as well as systems working at deep ultraviolet wavelengths including 193, 248, and 365 nm.

  13. New self-assembly strategies for next generation lithography

    Science.gov (United States)

    Schwartz, Evan L.; Bosworth, Joan K.; Paik, Marvin Y.; Ober, Christopher K.

    2010-04-01

    Future demands of the semiconductor industry call for robust patterning strategies for critical dimensions below twenty nanometers. The self assembly of block copolymers stands out as a promising, potentially lower cost alternative to other technologies such as e-beam or nanoimprint lithography. One approach is to use block copolymers that can be lithographically patterned by incorporating a negative-tone photoresist as the majority (matrix) phase of the block copolymer, paired with photoacid generator and a crosslinker moiety. In this system, poly(α-methylstyrene-block-hydroxystyrene)(PαMS-b-PHOST), the block copolymer is spin-coated as a thin film, processed to a desired microdomain orientation with long-range order, and then photopatterned. Therefore, selfassembly of the block copolymer only occurs in select areas due to the crosslinking of the matrix phase, and the minority phase polymer can be removed to produce a nanoporous template. Using bulk TEM analysis, we demonstrate how the critical dimension of this block copolymer is shown to scale with polymer molecular weight using a simple power law relation. Enthalpic interactions such as hydrogen bonding are used to blend inorganic additives in order to enhance the etch resistance of the PHOST block. We demonstrate how lithographically patternable block copolymers might fit in to future processing strategies to produce etch-resistant self-assembled features at length scales impossible with conventional lithography.

  14. Fabrication of nanochannels on polyimide films using dynamic plowing lithography

    Science.gov (United States)

    Stoica, Iuliana; Barzic, Andreea Irina; Hulubei, Camelia

    2017-12-01

    Three distinct polyimide films were analyzed from the point of view of their morphology in order to determine if their surface features can be adapted for applications where surface anisotropy is mandatory. Channels of nanometric dimensions were created on surface of the specimens by using a less common atomic force microscopy (AFM) method, namely Dynamic Plowing Lithography (DPL). The changes generated by DPL procedure were monitored through the surface texture and other functional parameters, denoting the surface orientation degree and also bearing and fluid retention properties. The results revealed that in the same nanolithography conditions, the diamine and dianhydride moieties have affected the characteristics of the nanochannels. This was explained based on the aliphatic/aromatic nature of the monomers and the backbone flexibility. The reported data are of great importance in designing custom nanostructures with enhanced anisotropy on surface of polyimide films for liquid crystal orientation or guided cell growth purposes. At the end, to track the effect of the nanolithography process on the tip sharpness, degradation and contamination, the blind tip reconstruction was performed on AFM probe, before and after lithography experiments, using TGT1 test grating AFM image.

  15. The DARPA compact Superconducting X-Ray Lithography Source features

    International Nuclear Information System (INIS)

    Heese, R.; Kalsi, S.; Leung, E.

    1991-01-01

    Under DARPA sponsorship, a compact Superconducting X-Ray Lithography Source (SXLS) is being designed and built by the Brookhaven National Laboratory (BNL) with industry participation from Grumman Corporation and General Dynamics. This source is optimized for lithography work for sub-micron high density computer chips, and is about the size of a billiard table (1.5 m x 4.0 m). The machine has a racetrack configuration with two 180 degree bending magnets being designed and built by General Dynamics under a subcontract with Grumman Corporation. The machine will have 18 photon ports which would deliver light peaked at a wave length of 10 Angstroms. Grumman is commercializing the SXLS device and plans to book orders for delivery of industrialized SXLS (ISXLS) versions in 1995. This paper will describe the major features of this device. The commercial machine will be equipped with a fully automated user-friendly control systems, major features of which are already working on a compact warm dipole ring at BNL. This ring has normal dipole magnets with dimensions identical to the SXLS device, and has been successfully commissioned

  16. Layout compliance for triple patterning lithography: an iterative approach

    Science.gov (United States)

    Yu, Bei; Garreton, Gilda; Pan, David Z.

    2014-10-01

    As the semiconductor process further scales down, the industry encounters many lithography-related issues. In the 14nm logic node and beyond, triple patterning lithography (TPL) is one of the most promising techniques for Metal1 layer and possibly Via0 layer. As one of the most challenging problems in TPL, recently layout decomposition efforts have received more attention from both industry and academia. Ideally the decomposer should point out locations in the layout that are not triple patterning decomposable and therefore manual intervention by designers is required. A traditional decomposition flow would be an iterative process, where each iteration consists of an automatic layout decomposition step and manual layout modification task. However, due to the NP-hardness of triple patterning layout decomposition, automatic full chip level layout decomposition requires long computational time and therefore design closure issues continue to linger around in the traditional flow. Challenged by this issue, we present a novel incremental layout decomposition framework to facilitate accelerated iterative decomposition. In the first iteration, our decomposer not only points out all conflicts, but also provides the suggestions to fix them. After the layout modification, instead of solving the full chip problem from scratch, our decomposer can provide a quick solution for a selected portion of layout. We believe this framework is efficient, in terms of performance and designer friendly.

  17. Integrated lithography to prepare periodic arrays of nano-objects

    International Nuclear Information System (INIS)

    Sipos, Áron; Szalai, Anikó; Csete, Mária

    2013-01-01

    We present an integrated lithography method to prepare versatile nano-objects with variable shape and nano-scaled substructure, in wavelength-scaled periodic arrays with arbitrary symmetry. The idea is to illuminate colloid sphere monolayers by polarized beams possessing periodic lateral intensity modulations. Finite element method was applied to determine the effects of the wavelength, polarization and angle of incidence of the incoming beam, and to predict the characteristics of nano-objects, which can be fabricated on thin metal layer covered substrates due to the near-field enhancement under silica colloid spheres. The inter-object distance is controlled by varying the relative orientation of the periodic intensity modulation with respect to the silica colloid sphere monolayer. It is shown that illuminating silica colloid sphere monolayers by two interfering beams, linear patterns made of elliptical holes appear in case of linear polarization, while circularly polarized beams result in co-existent rounded objects, as more circular nano-holes and nano-crescents. The size of the nano-objects and their sub-structure is determined by the spheres diameter and by the wavelength. We present various complex plasmonic patterns made of versatile nano-objects that can be uniquely fabricated applying the inherent symmetry breaking possibilities in the integrated lithography method.

  18. X-ray lithography for micro and nanotechnology at RRCAT

    International Nuclear Information System (INIS)

    Shukla, Rahul; Dhamgaye, V.P.; Jain, V.K.; Lodha, G.S.

    2013-01-01

    At Indus-2 Soft and Deep X-ray Lithography beamline (BL-07) is functional and is capable of developing various high aspect ratio and high resolution structures at micro and nano scale. These micro and nano structures can be made to work as a mechanism, sensor, actuator and transducer for varieties of applications and serve as basic building blocks for the development of X-ray and IR optics, LASERs, lab-on-a-chip, micromanipulators and nanotechnology. To achieve these goals we have started developing high aspect ratio comb-drives, electrostatic micromotors, micro fluidic channels, X-ray optics and novel transducers for RF applications by Deep X-ray Lithography (DXRL). Comb-drive is one of most studied electrostatic device in MEMS (Micro Electro-Mechanical Systems). It can be used as a sensor, actuator, resonator, energy harvester and filter. Analysis and simulation shows that the comb actuator of aspect ratio 16 (air gap 50 μm) will produce nearly 1.25 μm displacement when DC voltage of 100 V is applied. For fabrication, first time in India, Polyimide X-ray mask is realized and exposure and development is done at BL-7 at RRCAT. The displacement increases as gap between comb finger decreases. Further refinement is in progress to get higher output from high aspect ratio (∼ 80) comb actuators (i.e. 1 μm at 5V). The other important design parameters like resonance frequency, capacitance will also be discussed. (author)

  19. Integral characteristics of spectra of ions important for EUV lithography

    International Nuclear Information System (INIS)

    Karazija, R; Kucas, S; Momkauskaite, A

    2006-01-01

    The emission spectrum corresponding to the 4p 5 4d N+1 + 4p 6 4d N-1 4f → 4p 6 4d N transition array is concentrated in a narrow interval of wavelengths. That is due to the existence of an approximate selection rule and quenching of some lines by configuration mixing. Thus such emission of elements near Z = 50 is considered to be the main candidate for the EUV lithography source at λ = 13.5 nm. In the present work the regularities of these transition arrays are considered using their integral characteristics: average energy, total line strength, variance and interval of array containing some part of the total transition probability. Calculations for various ions of elements In, Sn, Sb, Te, I and Xe have been performed in a two-configuration pseudorelativistic approximation, which describes fairly well the main features of the spectra. The variation in the values of the main integral characteristics of the spectra with atomic number and ionization degree gives the possibility of comparing quantitatively the suitability of the emission of various ions for EUV lithography

  20. Direct modification of silicon surface by nanosecond laser interference lithography

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Dapeng [JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022 (China); JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU (United Kingdom); Wang, Zuobin, E-mail: wangz@cust.edu.cn [JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022 (China); JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU (United Kingdom); Zhang, Ziang [JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022 (China); Yue, Yong [JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022 (China); JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU (United Kingdom); Li, Dayou [JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU (United Kingdom); Maple, Carsten [JR3CN and CNM (Changchun University of Science and Technology), Changchun 130022 (China); JR3CN and IRAC (University of Bedfordshire), Luton LU1 3JU (United Kingdom)

    2013-10-01

    Periodic and quasi-periodic structures on silicon surface have numerous significant applications in photoelectronics and surface engineering. A number of technologies have been developed to fabricate the structures in various research fields. In this work, we take the strategy of direct nanosecond laser interference lithography technology, and focus on the silicon material to create different well-defined surface structures based on theoretical analysis of the formation of laser interference patterns. Two, three and four-beam laser interference systems were set up to fabricate the grating, regular triangle and square structures on silicon surfaces, respectively. From the AFM micrographs, the critical features of structures have a dependence on laser fluences. For a relative low laser fluence, grating and dot structures formed with bumps due to the Marangoni Effect. With the increase of laser fluences, melt and evaporation behaviors can be responsible for the laser modification. By properly selecting the process parameters, well-defined grating and dot structures can been achieved. It can be demonstrated that direct laser interference lithography is a facile and efficient technology with the advantage of a single process procedure over macroscale areas for the fabrication of micro and nano structures.

  1. Business dynamics of lithography at very low k1 factors

    Science.gov (United States)

    Harrell, Sam; Preil, Moshe E.

    1999-07-01

    Lithography is the largest capital investment and the largest operating cost component of leading edge semiconductor fabs. In addition, it is the dominant factor in determining the performance of a semiconductor device and is important in determining the yield and thus the economics of a semiconductor circuit. To increase competitiveness and broaden adoption of circuits and the end products in which they are used, there has been and continues to be a dramatic acceleration in the industry roadmap. A critical factor in the acceleration is driving the lithographic images to smaller feature size. There has always been economic tension between the pace of change and the resultant circuit cost. The genius of the semiconductor industry has been in its ability to balance its technology with economic factors and deliver outstanding value to those using the circuits to add value to their end products. The critical question today is whether optical lithography can be successfully and economically extended to maintain and improve the economic benefits of higher complexity circuits. In this paper we will discuss some of these significant tradeoffs required to maintain optically based lithographic progress on the roadmap at acceptable cost.

  2. Fabrication of biomimetic dry-adhesion structures through nanosphere lithography

    Science.gov (United States)

    Kuo, P. C.; Chang, N. W.; Suen, Y.; Yang, S. Y.

    2018-03-01

    Components with surface nanostructures suitable for biomimetic dry adhesion have a great potential in applications such as gecko tape, climbing robots, and skin patches. In this study, a nanosphere lithography technique with self-assembly nanospheres was developed to achieve effective and efficient fabrication of dry-adhesion structures. Self-assembled monolayer nanospheres with high regularity were obtained through tilted dip-coating. Reactive-ion etching of the self-assembled nanospheres was used to fabricate nanostructures of different shapes and aspect ratios by varying the etching time. Thereafter, nickel molds with inverse nanostructures were replicated using the electroforming process. Polydimethylsiloxane (PDMS) nanostructures were fabricated through a gas-assisted hot-embossing method. The pulling test was performed to measure the shear adhesion on the glass substrate of a sample, and the static contact angle was measured to verify the hydrophobic property of the structure. The enhancement of the structure indicates that the adhesion force increased from 1.2 to 4.05 N/cm2 and the contact angle increased from 118.6° to 135.2°. This columnar structure can effectively enhance the adhesion ability of PDMS, demonstrating the potential of using nanosphere lithography for the fabrication of adhesive structures.

  3. Mask Materials and Designs for Extreme Ultra Violet Lithography

    Science.gov (United States)

    Kim, Jung Sik; Ahn, Jinho

    2018-03-01

    Extreme ultra violet lithography (EUVL) is no longer a future technology but is going to be inserted into mass production of semiconductor devices of 7 nm technology node in 2018. EUVL is an extension of optical lithography using extremely short wavelength (13.5 nm). This short wavelength requires major modifications in the optical systems due to the very strong absorption of EUV light by materials. Refractive optics can no longer be used, and reflective optics is the only solution to transfer image from mask to wafer. This is why we need the multilayer (ML) mirror-based mask as well as an oblique incident angle of light. This paper discusses the principal theory on the EUV mask design and its component materials including ML reflector and EUV absorber. Mask shadowing effect (or mask 3D effect) is explained and its technical solutions like phase shift mask is reviewed. Even though not all the technical issues on EUV mask are handled in this review paper, you will be able to understand the principles determining the performance of EUV masks.

  4. Large area nanoimprint by substrate conformal imprint lithography (SCIL)

    Science.gov (United States)

    Verschuuren, Marc A.; Megens, Mischa; Ni, Yongfeng; van Sprang, Hans; Polman, Albert

    2017-06-01

    Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm2 to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3-4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.

  5. Integration of plant viruses in electron beam lithography nanostructures

    International Nuclear Information System (INIS)

    Alonso, Jose M; Bittner, Alexander M; Ondarçuhu, Thierry

    2013-01-01

    Tobacco mosaic virus (TMV) is the textbook example of a virus, and also of a self-assembling nanoscale structure. This tubular RNA/protein architecture has also found applications as biotemplate for the synthesis of nanomaterials such as wires, as tubes, or as nanoparticle assemblies. Although TMV is, being a biological structure, quite resilient to environmental conditions (temperature, chemicals), it cannot be processed in electron beam lithography (eBL) fabrication, which is the most important and most versatile method of nanoscale structuring. Here we present adjusted eBL-compatible processes that allow the incorporation of TMV in nanostructures made of positive and negative tone eBL resists. The key steps are covering TMV by polymer resists, which are only heated to 50 °C, and development (selective dissolution) in carefully selected organic solvents. We demonstrate the post-lithography biochemical functionality of TMV by selective immunocoating of the viral particles, and the use of immobilized TMV as direct immunosensor. Our modified eBL process should be applicable to incorporate a wide range of sensitive materials in nanofabrication schemes. (paper)

  6. Fabrication of sub-wavelength photonic structures by nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Kontio, J.

    2013-11-01

    Nanoimprint lithography (NIL) is a novel but already a mature lithography technique. In this thesis it is applied to the fabrication of nanophotonic devices using its main advantage: the fast production of sub-micron features in high volume in a cost-effective way. In this thesis, fabrication methods for conical metal structures for plasmonic applications and sub-wavelength grating based broad-band mirrors are presented. Conical metal structures, nanocones, with plasmonic properties are interesting because they enable concentrating the energy of light in very tight spots resulting in very high local intensities of electromagnetic energy. The nanocone formation process is studied with several metals. Enhanced second harmonic generation using gold nanocones is presented. Bridged-nanocones are used to enhance Raman scattering from a dye solution. The sub-wavelength grating mirror is an interesting structure for photonics because it is very simple to fabricate and its reflectivity can be extended to the far infrared wavelength range. It also has polarization dependent properties which are used in this thesis to stabilize the output beam of infrared semiconductor disk laser. NIL is shown to be useful a technique in the fabrication of nanophotonic devices in the novel and rapidly growing field of plasmonics and also in more traditional, but still developing, semiconductor laser applications (orig.)

  7. Chernobyl seed project. Advances in the identification of differentially abundant proteins in a radio-contaminated environment.

    Science.gov (United States)

    Rashydov, Namik M; Hajduch, Martin

    2015-01-01

    Plants have the ability to grow and successfully reproduce in radio-contaminated environments, which has been highlighted by nuclear accidents at Chernobyl (1986) and Fukushima (2011). The main aim of this article is to summarize the advances of the Chernobyl seed project which has the purpose to provide proteomic characterization of plants grown in the Chernobyl area. We present a summary of comparative proteomic studies on soybean and flax seeds harvested from radio-contaminated Chernobyl areas during two successive generations. Using experimental design developed for radio-contaminated areas, altered abundances of glycine betaine, seed storage proteins, and proteins associated with carbon assimilation into fatty acids were detected. Similar studies in Fukushima radio-contaminated areas might complement these data. The results from these Chernobyl experiments can be viewed in a user-friendly format at a dedicated web-based database freely available at http://www.chernobylproteomics.sav.sk.

  8. Environment, safety, health, and quality plan for the TRU- Contaminated Arid Soils Project of the Landfill Stabilization Focus Area Program

    International Nuclear Information System (INIS)

    Watson, L.R.

    1995-06-01

    The Landfill Stabilization Focus Area (LSFA) is a program funded by the US Department of Energy Office of Technology Development. LSFA supports the applied research, development, demonstration, testing, and evaluation of a suite of advanced technologies that together form a comprehensive remediation system for the effective and efficient remediation of buried waste. The TRU-Contaminated Arid Soils project is being conducted under the auspices of the LSFA Program. This document describes the Environment, Safety, Health, and Quality requirements for conducting LSFA/Arid Soils activities at the Idaho National Engineering Laboratory. Topics discussed in this report, as they apply to LSFA/Arid Soils operations, include Federal, State of Idaho, and Environmental Protection Agency regulations, Health and Safety Plans, Quality Program, Data Quality Objectives, and training and job hazard analysis. Finally, a discussion is given on CERCLA criteria and system and performance audits as they apply to the LSFA Program

  9. Analysis of Aviation Safety Reporting System Incident Data Associated with the Technical Challenges of the Atmospheric Environment Safety Technology Project

    Science.gov (United States)

    Withrow, Colleen A.; Reveley, Mary S.

    2014-01-01

    This study analyzed aircraft incidents in the NASA Aviation Safety Reporting System (ASRS) that apply to two of the three technical challenges (TCs) in NASA's Aviation Safety Program's Atmospheric Environment Safety Technology Project. The aircraft incidents are related to airframe icing and atmospheric hazards TCs. The study reviewed incidents that listed their primary problem as weather or environment-nonweather between 1994 and 2011 for aircraft defined by Federal Aviation Regulations (FAR) Parts 121, 135, and 91. The study investigated the phases of flight, a variety of anomalies, flight conditions, and incidents by FAR part, along with other categories. The first part of the analysis focused on airframe-icing-related incidents and found 275 incidents out of 3526 weather-related incidents over the 18-yr period. The second portion of the study focused on atmospheric hazards and found 4647 incidents over the same time period. Atmospheric hazards-related incidents included a range of conditions from clear air turbulence and wake vortex, to controlled flight toward terrain, ground encounters, and incursions.

  10. Seismic site survey investigations in urban environments: The case of the underground metro project in Copenhagen, Denmark.

    Science.gov (United States)

    Martínez, K.; Mendoza, J. A.; Colberg-Larsen, J.; Ploug, C.

    2009-05-01

    Near surface geophysics applications are gaining more widespread use in geotechnical and engineering projects. The development of data acquisition, processing tools and interpretation methods have optimized survey time, reduced logistics costs and increase results reliability of seismic surveys during the last decades. However, the use of wide-scale geophysical methods under urban environments continues to face great challenges due to multiple noise sources and obstacles inherent to cities. A seismic pre-investigation was conducted to investigate the feasibility of using seismic methods to obtain information about the subsurface layer locations and media properties in Copenhagen. Such information is needed for hydrological, geotechnical and groundwater modeling related to the Cityringen underground metro project. The pre-investigation objectives were to validate methods in an urban environment and optimize field survey procedures, processing and interpretation methods in urban settings in the event of further seismic investigations. The geological setting at the survey site is characterized by several interlaced layers of clay, till and sand. These layers are found unevenly distributed throughout the city and present varying thickness, overlaying several different unit types of limestone at shallow depths. Specific results objectives were to map the bedrock surface, ascertain a structural geological framework and investigate bedrock media properties relevant to the construction design. The seismic test consisted of a combined seismic reflection and refraction analyses of a profile line conducted along an approximately 1400 m section in the northern part of Copenhagen, along the projected metro city line. The data acquisition was carried out using a 192 channels array, receiver groups with 5 m spacing and a Vibroseis as a source at 10 m spacing. Complementarily, six vertical seismic profiles (VSP) were performed at boreholes located along the line. The reflection

  11. Human factors and technology environment in multinational project: problems and solutions; Factores humanos y entorno tecnologico en proyectos multinacionales: dificultades y soluciones

    Energy Technology Data Exchange (ETDEWEB)

    Jardi Besa, X.; Munoz Cervantes, A.

    2012-07-01

    At the onset of nuclear projects in Spain, there was an import of nuclear technology. In a second phase, there was a transfer of technology. Subsequently, there was an adaptation of the technology. In this evolution, comparable to that of other countries, were involved several countries, overcoming the difficulties of human factors involved. The current nuclear projects multinationals have a new difficulty: the different industrial technological environments. This paper will address the organizational challenges of multinational engineering projects, in the type of project and the human factors of the participating companies.

  12. Comparing long-term projections of the space debris environment to real world data - Looking back to 1990

    Science.gov (United States)

    Radtke, Jonas; Stoll, Enrico

    2016-10-01

    Long-term projections of the space debris environment are commonly used to assess the trends within different scenarios for the assumed future development of spacefaring. General scenarios investigated include business-as-usual cases in which spaceflight is performed as today and mitigation scenarios, assuming the implementation of Space Debris Mitigation Guidelines at different advances or the effectiveness of more drastic measures, such as active debris removal. One problem that always goes along with the projection of a system's behaviour in the future is that affecting parameters, such as the launch rate, are unpredictable. It is common to look backwards and re-model the past in other fields of research. This is a rather difficult task for spaceflight as it is still quite young, and furthermore mostly influenced by drastic politic changes, as the break-down of the Soviet Union in the end of the 1980s. Furthermore, one major driver of the evolution of the number of on-orbit objects turn out to be collisions between objects. As of today, these collisions are, fortunately, very rare and therefore, a real-world-data modelling approach is difficult. Nevertheless, since the end of the cold war more than 20 years of a comparably stable evolution of spaceflight activities have passed. For this study, this period is used in a comparison between the real evolution of the space debris environment and that one projected using the Institute of Space System's in-house tool for long-term assessment LUCA (Long-Term Utility for Collision Analysis). Four different scenarios are investigated in this comparison; all of them have the common starting point of using an initial population for 1st May 1989. The first scenario, which serves as reference, is simply taken from MASTER-2009. All launch and mission related objects from the Two Line Elements (TLE) catalogue and other available sources are included. All events such as explosion and collision events have been re-modelled as

  13. Demonstration of electronic pattern switching and 10x pattern demagnification in a maskless micro-ion beam reduction lithography system

    International Nuclear Information System (INIS)

    Ngo, V.V.; Akker, B.; Leung, K.N.; Noh, I.; Scott, K.L.; Wilde, S.

    2002-01-01

    A proof-of-principle ion projection lithography (IPL) system called Maskless Micro-ion beam Reduction Lithography (MMRL) has been developed and tested at the Lawrence Berkeley National Laboratory (LBNL) for future integrated circuits (ICs) manufacturing and thin film media patterning [1]. This MMRL system is aimed at completely eliminating the first stage of the conventional IPL system [2] that contains the complicated beam optics design in front of the stencil mask and the mask itself. It consists of a multicusp RF plasma generator, a multi-beamlet pattern generator, and an all-electrostatic ion optical column. Results from ion beam exposures on PMMA and Shipley UVII-HS resists using 75 keV H+ are presented in this paper. Proof-of-principle electronic pattern switching together with 10x reduction ion optics (using a pattern generator made of nine 50-(micro)m switchable apertures) has been performed and is reported in this paper. In addition, the fabrication of a micro-fabricated pattern generator [3] on an SOI membrane is also presented

  14. Between a rock and a hard place: Management and implementation teams’ expectations of project managers in an agile information systems delivery environment

    Directory of Open Access Journals (Sweden)

    Songezo Nkukwana

    2017-08-01

    Objectives: This case study investigated how project managers could adapt to agile IS implementation environments to remain relevant. Specifically, the views of their key stakeholders (the management and implementation teams were elicited to provide insights into what is expected from agile project managers. Method: A qualitative, inductive content analysis approach using purposive sampling was used to identify 13 participants (comprising management and implementation team members within a large South African insurance company. Semi-structured interviews were conducted with all participants. Results: The management and implementation teams agreed that PM remains highly relevant in an agile environment for ensuring project governance including delivery, risk management, reporting and budgeting. There was, however, disagreement between the management and implementation teams on project management interaction with the implementation team. Management preferred a command and control type project manager, while the implementation team favoured a more inclusive, facilitative PM style. Conclusion: To remain viable in an agile IS project implementation environment within large corporates, project managers need to be aware of what various stakeholders expect of them. They need to retain some of the classic PM functions while adapting to the interpersonal and collaborative requirements of the agile way.

  15. DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates

    DEFF Research Database (Denmark)

    Smistrup, K.; Nørregaard, J.; Mironov, A.

    2013-01-01

    by including a lambda quarter shift at the center of the grating. The need for phase shifts and multiple wavelengths eliminates some lithography methods such as holography. Typically, these lasers are produced by e-beam lithography (EBL). We present a production method based on thermal nanoimprint lithography...... during the imprint process and the narrow temperature window for imprint and separation (80°C and 55°C) ensures minimal issues with thermal mismatch between the InP substrate and the Si stamp. The imprinted InP wafers were processed in NeoPhotonics standard process line to create working lasers...

  16. Fabrication of three-dimensional millimeter-height structures using direct ultraviolet lithography on liquid-state photoresist for simple and fast manufacturing

    Science.gov (United States)

    Kim, Jungkwun; Yoon, Yong-Kyu

    2015-07-01

    A rapid three-dimensional (3-D) ultraviolet (UV) lithography process for the fabrication of millimeter-tall high aspect ratio complex structures is presented. The liquid-state negative-tone photosensitive polyurethane, LF55GN, has been directly photopatterned using multidirectionally projected UV light for 3-D micropattern formation. The proposed lithographic scheme enabled us to overcome the maximum height obtained with a photopatternable epoxy, SU8, which has been conventionally most commonly used for the fabrication of tall and high aspect ratio microstructures. Also, the fabrication process time has been significantly reduced by eliminating photoresist-baking steps. Computer-controlled multidirectional UV lithography has been employed to fabricate 3-D structures, where the UV-exposure substrate is dynamically tilt-rotating during UV exposure to create various 3-D ray traces in the polyurethane layer. LF55GN has been characterized to provide feasible fabrication conditions for the multidirectional UV lithography. Very tall structures including a 6-mm tall triangular slab and a 5-mm tall hexablaze have been successfully fabricated. A 4.5-mm tall air-lifted polymer-core bowtie monopole antenna, which is the tallest monopole structure fabricated by photolithography and subsequent metallization, has been successfully demonstrated. The antenna shows a resonant radiation frequency of 12.34 GHz, a return loss of 36 dB, and a 10 dB bandwidth of 7%.

  17. Interconnecting sensors and people to improve the knowledge and sustainable management in rural and alpine environment: the CIRCE project

    Science.gov (United States)

    Cavallo, Eugenio; Biddoccu, Marcella; Bagagiolo, Giorgia; De Marziis, Massimo; Gaia Forni, Emanuela; Alemanno, Laura; Ferraris, Stefano; Canone, Davide; Previati, Maurizio; Turconi, Laura; Arattano, Massimo; Coviello, Velio

    2016-04-01

    Environmental sensor monitoring is continuously developing, both in terms of quantity (i.e. measurement sites), and quality (i.e. technological innovation). Environmental monitoring is carried out by either public or private entities for their own specific purposes, such as scientific research, civil protection, support to industrial and agricultural activities, services for citizens, security, education, and information. However, the acquired dataset could be cross-appealing, hence, being interesting for purposes that diverted from their main intended use. The CIRCE project (Cooperative Internet-of-Data Rural-alpine Community Environment) aimed to gather, manage, use and distribute data obtained from sensors and from people, in a multipurpose approach. The CIRCE project was selected within a call for tender launched by Piedmont Region (in collaboration with CSI Piemonte) in order to improve the digital ecosystem represented by YUCCA, an open source platform oriented to the acquisition, sharing and reuse of data resulting both from real-time and on-demand applications. The partnership of the CIRCE project was made by scientific research bodies (IMAMOTER-CNR, IRPI-CNR, DIST) together with SMEs involved in environmental monitoring and ICT sectors (namely: 3a srl, EnviCons srl, Impresa Verde Cuneo srl, and NetValue srl). Within the project a shared network of agro-meteo-hydrological sensors has been created. Then a platform and its interface for collection, management and distribution of data has been developed. The CIRCE network is currently constituted by a total amount of 171 sensors remotely connected and originally belonging to different networks. They are settled-up in order to monitor and investigate agro-meteo-hydrological processes in different rural and mountain areas of Piedmont Region (NW-Italy), including some very sensitive locations, but difficult to access. Each sensor network differs from each other, in terms of purpose of monitoring, monitored

  18. Inventory of Federal energy-related environment and safety research for FY 1977. Volume II. Project listings

    Energy Technology Data Exchange (ETDEWEB)

    1978-07-01

    This volume contains Biomedical and Environmental Research, Environmental Control Technology Research, and Operational and Environmental Safety Research project listings. The projects are ordered numerically by log number.

  19. Accurate lithography simulation model based on convolutional neural networks

    Science.gov (United States)

    Watanabe, Yuki; Kimura, Taiki; Matsunawa, Tetsuaki; Nojima, Shigeki

    2017-07-01

    Lithography simulation is an essential technique for today's semiconductor manufacturing process. In order to calculate an entire chip in realistic time, compact resist model is commonly used. The model is established for faster calculation. To have accurate compact resist model, it is necessary to fix a complicated non-linear model function. However, it is difficult to decide an appropriate function manually because there are many options. This paper proposes a new compact resist model using CNN (Convolutional Neural Networks) which is one of deep learning techniques. CNN model makes it possible to determine an appropriate model function and achieve accurate simulation. Experimental results show CNN model can reduce CD prediction errors by 70% compared with the conventional model.

  20. X-ray lithography source (SXLS) vacuum system

    International Nuclear Information System (INIS)

    Schuchman, J.C.; Aloia, J.; Hsieh, H.; Kim, T.; Pjerov, S.

    1989-01-01

    In 1988 Brookhaven National Laboratory (BNL) was awarded a contract to design and construct a compact light source for x-ray lithography. This award is part of a technology transfer-to-American-industry program. The contract is for an electron storage ring designed for 690 MeV-500 ma operations. It has a racetrack configuration with a circumference to 8.5 meters. The machine is to be constructed in two phases. Phase I (200 MeV-500ma) will primarily be for low energy injection studies and will incorporate all room temperature magnets. For Phase II the two room temperature dipole magnets will be replaced with (4T) superconducting magnets and operation will be at 690 MeV. This paper describes the vacuum system for this machine. 9 refs

  1. Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography

    International Nuclear Information System (INIS)

    Alayo, Nerea; Bausells, Joan; Pérez-Murano, Francesc; Conde-Rubio, Ana; Labarta, Amilcar; Batlle, Xavier; Borrisé, Xavier

    2015-01-01

    Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition. (paper)

  2. Method for the protection of extreme ultraviolet lithography optics

    Science.gov (United States)

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  3. Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling

    International Nuclear Information System (INIS)

    Köpplmayr, Thomas; Häusler, Lukas; Bergmair, Iris; Mühlberger, Michael

    2015-01-01

    Fused deposition modelling (FDM) is an additive manufacturing technology commonly used for modelling, prototyping and production applications. The achievable surface roughness is one of its most limiting aspects. It is however of great interest to create well-defined (nanosized) patterns on the surface for functional applications such as optical effects, electronics or bio-medical devices. We used UV-curable polymers of different viscosities and flexible stamps made of poly(dimethylsiloxane) (PDMS) to perform Nanoimprint Lithography (NIL) on FDM-printed curved parts. Substrates with different roughness and curvature were prepared using a commercially available 3D printer. The nanoimprint results were characterized by optical light microscopy, profilometry and atomic force microscopy (AFM). Our experiments show promising results in creating well-defined microstructures on the 3D-printed parts. (paper)

  4. A poly(dimethylsiloxane)-coated flexible mold for nanoimprint lithography

    International Nuclear Information System (INIS)

    Lee, Nae Yoon; Kim, Youn Sang

    2007-01-01

    In this paper, we introduce an anti-adhesion poly(dimethylsiloxane) (PDMS)-coated flexible mold and its applications for room-temperature imprint lithography. The flexible mold is fabricated using an ultraviolet-curable prepolymer on a flexible substrate, and its surface is passivated with a thin layer of PDMS to impart an anti-adhesion property. The highly flexible mold enables conformal contact with a substrate on which a low-viscosity polymer resist is spin-cast in a thin layer. Large-area imprinting is then realized at room temperature under significantly reduced pressure. The mold was durable even after repetitive imprinting of over 200 times. Also, we show a double imprinting on the substrate with a PDMS-coated replica polymeric mold having 500 nm line patterns. This enables the formation of matrix patterns with varying feature heights in less than 7 min

  5. Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography.

    Science.gov (United States)

    Alayo, Nerea; Conde-Rubio, Ana; Bausells, Joan; Borrisé, Xavier; Labarta, Amilcar; Batlle, Xavier; Pérez-Murano, Francesc

    2015-11-06

    Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition.

  6. A 3D-printed device for polymer nanoimprint lithography

    Science.gov (United States)

    Caño-García, Manuel; Geday, Morten A.; Gil-Valverde, Manuel; Megías Zarco, Antonio; Otón, José M.; Quintana, Xabier

    2018-02-01

    Nanoimprint lithography (NIL) is an imprinting technique which has experienced an increasing popularity due to its versatility in fabrication processes. Commercial NIL machines are readily available achieving high quality results; however, these machines involve a relatively high investment. Hence, small laboratories often choose to perform NIL copies in a more rudimentary and cheaper way. A new simple system is presented in this document. It is based on two devices which can be made in-house in plastic by using a 3D printer or in aluminum. Thus, the overall manufacturing complexity is vastly reduced. The presented system includes pressure control and potentially temperature control. Replicas have been made using a sawtooth grating master with a pitch around half micrometre. High quality patterns with low density of imperfections have been achieved in 2.25 cm2 surfaces. The material chosen for the negative intermediary mould is PDMS. Tests of the imprint have been performed using the commercial hybrid polymer Ormostamp®.

  7. High speed hydraulic scanner for deep x-ray lithography

    International Nuclear Information System (INIS)

    Milne, J.C.; Johnson, E.D.

    1997-07-01

    From their research and development in hard x-ray lithography, the authors have found that the conventional leadscrew driven scanner stages do not provide adequate scan speed or travel. These considerations have led the authors to develop a scanning system based on a long stroke hydraulic drive with 635 mm of travel and closed loop feedback to position the stage to better than 100 micrometers. The control of the device is through a PC with a custom LabView interface coupled to simple x-ray beam diagnostics. This configuration allows one to set a variety of scan parameters, including target dose, scan range, scan rates, and dose rate. Results from the prototype system at beamline X-27B are described as well as progress on a production version for the X-14B beamline

  8. Joint optimization of source, mask, and pupil in optical lithography

    Science.gov (United States)

    Li, Jia; Lam, Edmund Y.

    2014-03-01

    Mask topography effects need to be taken into consideration for more advanced resolution enhancement techniques in optical lithography. However, rigorous 3D mask model achieves high accuracy at a large computational cost. This work develops a combined source, mask and pupil optimization (SMPO) approach by taking advantage of the fact that pupil phase manipulation is capable of partially compensating for mask topography effects. We first design the pupil wavefront function by incorporating primary and secondary spherical aberration through the coefficients of the Zernike polynomials, and achieve optimal source-mask pair under the condition of aberrated pupil. Evaluations against conventional source mask optimization (SMO) without incorporating pupil aberrations show that SMPO provides improved performance in terms of pattern fidelity and process window sizes.

  9. Vitreous carbon mask substrate for X-ray lithography

    Science.gov (United States)

    Aigeldinger, Georg [Livermore, CA; Skala, Dawn M [Fremont, CA; Griffiths, Stewart K [Livermore, CA; Talin, Albert Alec [Livermore, CA; Losey, Matthew W [Livermore, CA; Yang, Chu-Yeu Peter [Dublin, CA

    2009-10-27

    The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.

  10. High speed hydraulic scanner for deep x-ray lithography

    Energy Technology Data Exchange (ETDEWEB)

    Milne, J.C.; Johnson, E.D.

    1997-07-01

    From their research and development in hard x-ray lithography, the authors have found that the conventional leadscrew driven scanner stages do not provide adequate scan speed or travel. These considerations have led the authors to develop a scanning system based on a long stroke hydraulic drive with 635 mm of travel and closed loop feedback to position the stage to better than 100 micrometers. The control of the device is through a PC with a custom LabView interface coupled to simple x-ray beam diagnostics. This configuration allows one to set a variety of scan parameters, including target dose, scan range, scan rates, and dose rate. Results from the prototype system at beamline X-27B are described as well as progress on a production version for the X-14B beamline.

  11. Solid state microcavity dye lasers fabricated by nanoimprint lithography

    DEFF Research Database (Denmark)

    Nilsson, Daniel; Nielsen, Theodor; Kristensen, Anders

    2004-01-01

    propagating TE–TM modes. The laser cavity has the lateral shape of a trapezoid, supporting lasing modes by reflection on the vertical cavity walls. The solid polymer dye lasers emit laterally through one of the vertical cavity walls, when pumped optically through the top surface by means of a frequency...... doubled, pulsed Nd:YAG laser. Lasing in the wavelength region from 560 to 570 nm is observed from a laser with a side-length of 50 µm. In this proof of concept, the lasers are multimode with a mode wavelength separation of approximately 1.6 nm, as determined by the waveguide propagation constant......We present a solid state polymer microcavity dye laser, fabricated by thermal nanoimprint lithography (NIL) in a dye-doped thermoplast. The thermoplast poly-methylmethacrylate (PMMA) is used due to its high transparency in the visible range and its robustness to laser radiation. The laser dye...

  12. Uniformity across 200 mm silicon wafers printed by nanoimprint lithography

    International Nuclear Information System (INIS)

    Gourgon, C; Perret, C; Tallal, J; Lazzarino, F; Landis, S; Joubert, O; Pelzer, R

    2005-01-01

    Uniformity of the printing process is one of the key parameters of nanoimprint lithography. This technique has to be extended to large size wafers to be useful for several industrial applications, and the uniformity of micro and nanostructures has to be guaranteed on large surfaces. This paper presents results of printing on 200 mm diameter wafers. The residual thickness uniformity after printing is demonstrated at the wafer scale in large patterns (100 μm), in smaller lines of 250 nm and in sub-100 nm features. We show that a mould deformation occurs during the printing process, and that this deformation is needed to guarantee printing uniformity. However, the mould deformation is also responsible for the potential degradation of the patterns

  13. Polystyrene negative resist for high-resolution electron beam lithography

    Directory of Open Access Journals (Sweden)

    Ma Siqi

    2011-01-01

    Full Text Available Abstract We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be achieved both at 20 and 5 keV beam energies using different developers. In addition to its ultra-high resolution capability, polystyrene is a simple and low-cost resist with easy process control and practically unlimited shelf life. It is also considerably more resistant to dry etching than PMMA. With a low sensitivity, it would find applications where negative resist is desired and throughput is not a major concern.

  14. Rapid fabrication of microneedles using magnetorheological drawing lithography.

    Science.gov (United States)

    Chen, Zhipeng; Ren, Lei; Li, Jiyu; Yao, Lebin; Chen, Yan; Liu, Bin; Jiang, Lelun

    2018-01-01

    Microneedles are micron-sized needles that are widely applied in biomedical fields owing to their painless, minimally invasive, and convenient operation. However, most microneedle fabrication approaches are costly, time consuming, involve multiple steps, and require expensive equipment. In this study, we present a novel magnetorheological drawing lithography (MRDL) method to efficiently fabricate microneedle, bio-inspired microneedle, and molding-free microneedle array. With the assistance of an external magnetic field, the 3D structure of a microneedle can be directly drawn from a droplet of curable magnetorheological fluid. The formation process of a microneedle consists of two key stages, elasto-capillary self-thinning and magneto-capillary self-shrinking, which greatly affect the microneedle height and tip radius. Penetration and fracture tests demonstrated that the microneedle had sufficient strength and toughness for skin penetration. Microneedle arrays and a bio-inspired microneedle were also fabricated, which further demonstrated the versatility and flexibility of the MRDL method. Microneedles have been widely applied in biomedical fields owing to their painless, minimally invasive, and convenient operation. However, most microneedle fabrication approaches are costly, time consuming, involve multiple steps, and require expensive equipment. Furthermore, most researchers have focused on the biomedical applications of microneedles but have given little attention to the optimization of the fabrication process. This research presents a novel magnetorheological drawing lithography (MRDL) method to fabricate microneedle, bio-inspired microneedle, and molding-free microneedle array. In this proposed technique, a droplet of curable magnetorheological fluid (CMRF) is drawn directly from almost any substrate to produce a 3D microneedle under an external magnetic field. This method not only inherits the advantages of thermal drawing approach without the need for a mask

  15. Lithography-induced limits to scaling of design quality

    Science.gov (United States)

    Kahng, Andrew B.

    2014-03-01

    Quality and value of an IC product are functions of power, performance, area, cost and reliability. The forthcoming 2013 ITRS roadmap observes that while manufacturers continue to enable potential Moore's Law scaling of layout densities, the "realizable" scaling in competitive products has for some years been significantly less. In this paper, we consider aspects of the question, "To what extent should this scaling gap be blamed on lithography?" Non-ideal scaling of layout densities has been attributed to (i) layout restrictions associated with multi-patterning technologies (SADP, LELE, LELELE), as well as (ii) various ground rule and layout style choices that stem from misalignment, reliability, variability, device architecture, and electrical performance vs. power constraints. Certain impacts seem obvious, e.g., loss of 2D flexibility and new line-end placement constraints with SADP, or algorithmically intractable layout stitching and mask coloring formulations with LELELE. However, these impacts may well be outweighed by weaknesses in design methodology and tooling. Arguably, the industry has entered a new era in which many new factors - (i) standard-cell library architecture, and layout guardbanding for automated place-and-route: (ii) performance model guardbanding and signoff analyses: (iii) physical design and manufacturing handoff algorithms spanning detailed placement and routing, stitching and RET; and (iv) reliability guardbanding - all contribute, hand in hand with lithography, to a newly-identified "design capability gap". How specific aspects of process and design enablements limit the scaling of design quality is a fundamental question whose answer must guide future RandD investment at the design-manufacturing interface. terface.

  16. Prenatal co-exposure to neurotoxic metals and neurodevelopment in preschool children: The Environment and Childhood (INMA) Project.

    Science.gov (United States)

    Freire, Carmen; Amaya, Esperanza; Gil, Fernando; Fernández, Mariana F; Murcia, Mario; Llop, Sabrina; Andiarena, Ainara; Aurrekoetxea, Juanjo; Bustamante, Mariona; Guxens, Mònica; Ezama, Esteban; Fernández-Tardón, Guillermo; Olea, Nicolás

    2018-04-15

    We sought to determine whether prenatal co-exposure to As, Cd, Hg, Mn, and Pb was associated with impaired neurodevelopment in preschool children from the Spanish Environment and Childhood (INMA) Project, using the placenta as exposure matrix. We measured metal levels in placenta tissue samples randomly selected from five of the seven population-based birth cohorts participating in the INMA Project, collected between 2000 and 2008. Neuropsychological assessment of cognitive and motor function was carried through the use of the McCarthy Scales of Children's Abilities (MSCA) at the age of 4-5years. Data on placental metal levels, MSCA scores, and relevant covariates was available for 302 children. Mn was detected in all placental samples, Cd in nearly all placentas (99%) and As, Hg, and Pb in 22%, 58%, and 17% of the placentas, respectively. After adjusting for potential confounders, detectable As levels were associated with decrements in global and verbal executive functions and quantitative abilities; detectable Hg was associated with lower scores on the verbal function of posterior cortex in a dose-response manner, and non-linearly related to poorer motor function and gross motor skills; and Mn levels were associated with decrement in perceptual-performance skills in a dose-response manner but with better memory span and quantitative skills. A synergistic interactive effect was found between As and Pb with respect to the general cognitive score, whereas an antagonistic interaction was found between Mn and Hg. Prenatal exposure to As and Hg may be a risk factor for cognitive and motor impairment in children, while the effects of Cd and Mn on neurodevelopment are less clear. Future studies should examine combined and interactive effects of exposure to multiple metals during vulnerable periods of brain development prospectively. Copyright © 2017 Elsevier B.V. All rights reserved.

  17. Parental eating behaviours, home food environment and adolescent intakes of fruits, vegetables and dairy foods: longitudinal findings from Project EAT.

    Science.gov (United States)

    Arcan, Chrisa; Neumark-Sztainer, Dianne; Hannan, Peter; van den Berg, Patricia; Story, Mary; Larson, Nicole

    2007-11-01

    To examine longitudinal associations of parental report of household food availability and parent intakes of fruits, vegetables and dairy foods with adolescent intakes of the same foods. This study expands upon the limited research of longitudinal studies examining the role of parents and household food availability in adolescent dietary intakes. Longitudinal study. Project EAT-II followed an ethnically and socio-economically diverse sample of adolescents from 1999 (time 1) to 2004 (time 2). In addition to the Project EAT survey, adolescents completed the Youth Adolescent Food-Frequency Questionnaire in both time periods, and parents of adolescents completed a telephone survey at time 1. General linear modelling was used to examine the relationship between parent intake and home availability and adolescent intake, adjusting for time 1 adolescent intakes. Associations were examined separately for the high school and young adult cohorts and separately for males and females in combined cohorts. The sample included 509 pairs of parents/guardians and adolescents. Vegetables served at dinner significantly predicted adolescent intakes of vegetables for males (P = 0.037), females (P = 0.009), high school (P = 0.033) and young adults (P = 0.05) at 5-year follow-up. Among young adults, serving milk at dinner predicted dairy intake (P = 0.002). Time 1 parental intakes significantly predicted intakes of young adults for fruit (P = 0.044), vegetables (P = 0.041) and dairy foods (P = 0.008). Parental intake predicted intake of dairy for females (P = 0.02). The findings suggest the importance of providing parents of adolescents with knowledge and skills to enhance the home food environment and improve their own eating behaviours.

  18. Rainwater, a tool for development and maintenance of nature in the city - Three development projects illustrating the water as a support of natural processes in urban environment

    Directory of Open Access Journals (Sweden)

    Christian Piel

    2013-01-01

    Full Text Available The problems of manage urban stormwater are gradually taken into account by planners and landscapers. If the ecological potential of the temporary retention techniques is correctly operated in peri-urban areas, it is too little valued in a dense urban environment. Dense urban environment where the demand of nature is becoming stronger.Presented three projects in dense urban areas, where rainwater is treated as support nature, and as a factor in natural processes.These projects also aim to show how the problem of flood is a support social, legal, and financial, to implement these natural processes, so necessary in urban areas.

  19. The Project on the distribution of fallout radionuclide and their transfer through environment by Fukushima Daiichi NPP accident

    Science.gov (United States)

    Onda, Yuichi; Kato, Hiroaki; Yoshimura, Kazuya; Fukushima, Takehiko; Patin, Jeremy

    2013-04-01

    Radioactive contamination has been detected in Fukushima due to the nuclear accident at Fukushima Daiichi Nuclear Power Plant (NPP) following the earthquake and tsunami on 11 March 2011. Following comprehensive investigation (FMWSE project funded by MEXT, Japan; http://fmwse.suiri.tsukuba.ac.jp/) was conducted to confirm migration of radionuclides through natural environment including soils and rivers. Experimental catchments have been established in Yamakiya district, Kawamata Town, Fukushima prefecture, located about 35 km from Fukushima power plant, and designated as the evacuated zone. Approximate Cs-137 fallout in this area is 200 - 600 kBq/m2. (1) Migration study of radionuclides in natural environment including forests and rivers: 1) Depth distribution of radiocaesium in soils within forests, fields, and grassland, 2) Confirmation of radionuclide distribution and investigation on migration in forests, 3) Study on radionuclide migration due to soil erosion under different land use, 4) Measurement of radionuclides entrained from natural environment including forests and soils. (2) Migration study of radionuclides through hydrological cycle such as soil water, rivers, lakes and ponds, ground water: 1) Investigation on radionuclide migration through soil water, ground water, stream water, spring water under different land use, 2) Study on paddy-to-river transfer of radionuclides through suspended sediments, 3) Study on river-to-ocean transfer of radionuclides via suspended sediments, 4) Confirmation of radionuclide deposition in ponds and reservoirs. The main finding is as follows: 1) Migration of radionuclides to soil water, stream water and ground water was confirmed low at present. On the other hand, concentration of radiocaesium was found approximately 50 kBq/kg in the suspended sediments flowing down the river. 2) Amount of sediments deposited in the tank placed at the end of downstream within the USLE plot was confirmed together with the concentrations of

  20. Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

    Science.gov (United States)

    Puttaraksa, Nitipon; Unai, Somrit; Rhodes, Michael W.; Singkarat, Kanda; Whitlow, Harry J.; Singkarat, Somsorn

    2012-02-01

    In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.

  1. Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

    International Nuclear Information System (INIS)

    Puttaraksa, Nitipon; Unai, Somrit; Rhodes, Michael W.; Singkarat, Kanda; Whitlow, Harry J.; Singkarat, Somsorn

    2012-01-01

    In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1–1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.

  2. Towards a social sustainability in higher education: Enhancing students’ solidarity and togetherness through collaborative projects in racially diverse learning environments

    Directory of Open Access Journals (Sweden)

    Juliet Ramohai

    2013-12-01

    Full Text Available One key goal in the mission and vision statement of the University of the Free State is to recruit the best and most diverse students who work in solidarity and togetherness across social and historical divides. This goal is further echoed in the academic divisions’ own mission and vision statements which endeavour to ensure that the broader institutional goals are met. The Faculty of Education in this institution for instance, in accordance with the institution’s vision, has included in their vision statement issues of diversity and social transformation which foreground the Faculty’s commitment to produce teachers who show solidarity in their dealings with others. A question that is worth considering though is how these mission and vision statements can be implemented in practice by lecturers in their classes. In this paper I report on an action research project towards the realisation of the vision of togetherness and solidarity of the University of the Free State and the Faculty of Education, in which spaces are created for collaborative work for Honours classes. The results from this classroom practice indicate that students’ solidarity and togetherness in racially diverse learning environments can be enhanced through collaborative students’ work designed by lecturers.

  3. Report of the workshop on transferring X-ray Lithography Synchrotron (XLS) technology to industry

    Energy Technology Data Exchange (ETDEWEB)

    Marcuse, W.

    1987-01-01

    This paper reports on plans to develop an x-ray synchrotron for use in lithography. The primary concern of the present paper is technology transfer from national laboratories to private industry. (JDH)

  4. Planar self-aligned imprint lithography for coplanar plasmonic nanostructures fabrication

    KAUST Repository

    Wan, Weiwei; Lin, Liang; Xu, Yelong; Guo, Xu; Liu, Xiaoping; Ge, Haixiong; Lu, Minghui; Cui, Bo; Chen, Yanfeng

    2014-01-01

    manufacturing remains a challenge due to the high cost of achieving mechanical alignment precision. Although self-aligned imprint lithography was developed to avoid the need of alignment for the vertical layered structures, it has limited usage

  5. Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

    Energy Technology Data Exchange (ETDEWEB)

    Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee [Inha Univ, Incheon (Korea, Republic of)

    2016-08-15

    Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

  6. Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

    International Nuclear Information System (INIS)

    Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee

    2016-01-01

    Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed

  7. Retrieve polarization aberration from image degradation: a new measurement method in DUV lithography

    Science.gov (United States)

    Xiang, Zhongbo; Li, Yanqiu

    2017-10-01

    Detailed knowledge of polarization aberration (PA) of projection lens in higher-NA DUV lithographic imaging is necessary due to its impact to imaging degradations, and precise measurement of PA is conductive to computational lithography techniques such as RET and OPC. Current in situ measurement method of PA thorough the detection of degradations of aerial images need to do linear approximation and apply the assumption of 3-beam/2-beam interference condition. The former approximation neglects the coupling effect of the PA coefficients, which would significantly influence the accuracy of PA retrieving. The latter assumption restricts the feasible pitch of test masks in higher-NA system, conflicts with the Kirhhoff diffraction model of test mask used in retrieving model, and introduces 3D mask effect as a source of retrieving error. In this paper, a new in situ measurement method of PA is proposed. It establishes the analytical quadratic relation between the PA coefficients and the degradations of aerial images of one-dimensional dense lines in coherent illumination through vector aerial imaging, which does not rely on the assumption of 3-beam/2- beam interference and linear approximation. In this case, the retrieval of PA from image degradation can be convert from the nonlinear system of m-quadratic equations to a multi-objective quadratic optimization problem, and finally be solved by nonlinear least square method. Some preliminary simulation results are given to demonstrate the correctness and accuracy of the new PA retrieving model.

  8. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

    International Nuclear Information System (INIS)

    Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C.; Chow, W.W.

    1995-06-01

    Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera

  9. VIRTUAL ANTI-BULLYING VILLAGE PROJECT FOR COPING WITH BULLYING AND CYBERBULLYING WITHIN A 3D VIRTUAL LEARNING ENVIRONMENT: EVALUATION RESEARCH

    Directory of Open Access Journals (Sweden)

    Dorit Olenik Shemesh

    2014-12-01

    Full Text Available The current study aims to evaluate the implementation of a unique educational project- The Virtual Anti-Bullying Village for Kids and Teens (ABV4KIDS that was designed and operated by the European Commission. A 3D virtual environment as an innovative, international project for adolescents, focused on knowledge acquisition and new ways of coping with bullying and cyberbullying. Sixty seventh graders-Israeli adolescents-completed five questionnaires before and after the project to assess its impacts regarding cyberbullying and socio-emotional variables. They evaluated the project as important, enjoyable, and increasing their knowledge about cyberbullying, but expressed a need for more practical tools for coping. At the end of the project, the control group reported more cyberbullying experiences, as well as a decrease in social support, whereas the research group reported no changes in cyberbullying experiences and in socio-emotional aspects.

  10. The I.A.G. / A.I.G. SEDIBUD Book Project: Source-to-Sink Fluxes in Undisturbed Cold Environments

    Science.gov (United States)

    Beylich, Achim A.; Dixon, John C.; Zwolinski, Zbigniew

    2015-04-01

    The currently prepared SEDIBUD Book on "Source-to-Sink Fluxes in Undisturbed Cold Environments" (edited by Achim A. Beylich, John C. Dixon and Zbigniew Zwolinski and published by Cambridge University Press) is summarizing and synthesizing the achievements of the International Association of Geomorphologists` (I.A.G./A.I.G.) Working Group SEDIBUD (Sediment Budgets in Cold Environments), which has been active since 2005 (http://www.geomorph.org/wg/wgsb.html). Amplified climate change and ecological sensitivity of largely undisturbed polar and high-altitude cold climate environments have been highlighted as key global environmental issues. The effects of projected climate change will change surface environments in cold regions and will alter the fluxes of sediments, nutrients and solutes, but the absence of quantitative data and coordinated geomorphic process monitoring and analysis to understand the sensitivity of the Earth surface environment in these largely undisturbed environments is acute. Our book addresses this existing key knowledge gap. The applied approach of integrating comparable and longer-term field datasets on contemporary solute and sedimentary fluxes from a number of different defined cold climate catchment geosystems for better understanding (i) the environmental drivers and rates of contemporary denudational surface processes and (ii) possible effects of projected climate change in cold regions is unique in the field of geomorphology. Largely undisturbed cold climate environments can provide baseline data for modeling the effects of environmental change. The book synthesizes work carried out by numerous SEDIBUD Members over the last decade in numerous cold climate catchment geosystems worldwide. For reaching a global cover of different cold climate environments the book is - after providing an introduction part and a basic part on climate change in cold environments and general implications for solute and sedimentary fluxes - dealing in different

  11. Advancing semiconductor-electrocatalyst systems: application of surface transformation films and nanosphere lithography.

    Science.gov (United States)

    Brinkert, Katharina; Richter, Matthias H; Akay, Ömer; Giersig, Michael; Fountaine, Katherine T; Lewerenz, Hans-Joachim

    2018-05-24

    Photoelectrochemical (PEC) cells offer the possibility of carbon-neutral solar fuel production through artificial photosynthesis. The pursued design involves technologically advanced III-V semiconductor absorbers coupled via an interfacial film to an electrocatalyst layer. These systems have been prepared by in situ surface transformations in electrochemical environments. High activity nanostructured electrocatalysts are required for an efficiently operating cell, optimized in their optical and electrical properties. We demonstrate that shadow nanosphere lithography (SNL) is an auspicious tool to systematically create three-dimensional electrocatalyst nanostructures on the semiconductor photoelectrode through controlling their morphology and optical properties. First results are demonstrated by means of the photoelectrochemical production of hydrogen on p-type InP photocathodes where hitherto applied photoelectrodeposition and SNL-deposited Rh electrocatalysts are compared based on their J-V and spectroscopic behavior. We show that smaller polystyrene particle masks achieve higher defect nanostructures of rhodium on the photoelectrode which leads to a higher catalytic activity and larger short circuit currents. Structural analyses including HRSEM and the analysis of the photoelectrode surface composition by using photoelectron spectroscopy support and complement the photoelectrochemical observations. The optical performance is further compared to theoretical models of the nanostructured photoelectrodes on light scattering and propagation.

  12. Search for the evidence of endocrine disruption in the aquatic environment: Lessons to be learned from joint biological and chemical monitoring in the European Project COMPREHEND

    NARCIS (Netherlands)

    Eggen, R.I.L.; Bengtsson, B.E.; Bowmer, C.T.; Gerritsen, A.A.M.; Gibert, M.; Hylland, K.; Johnson, A.C.; Leonards, P.E.G.; Nakari, T.; Norrgren, L.; Sumpter, J.P.; Suter, M.J.F.; Svenson, A.; Pickering, A.D.

    2003-01-01

    Between January 1999 and December 2001, the European Community project COMPREHEND was performed. The overall aim of COMPREHEND was to assess endocrine disruption in the aquatic environment in Europe, consequent to effluent discharge, with emphasis on estrogenic activity. COMPREHEND demonstrated the

  13. The realization of two photovoltaic projects in the built environment. A comparison between Amsterdam and Amersfoort, both Netherlands

    International Nuclear Information System (INIS)

    Van Mierlo, B.

    1997-10-01

    The experiences of parties involved in the title projects are reported, focusing on the project management and its impact on further introduction of solar cells in the house construction sector. 18 refs

  14. PHOTOCITYTEX - A LIFE project on the air pollution treatment in European urban environments by means of photocatalytic textiles

    Science.gov (United States)

    Ródenas, Milagros; Fages, Eduardo; Fatarella, Enrico; Herrero, David; Castagnoli, Lidia; Borrás, Esther; Vera, Teresa; Gómez, Tatiana; Carreño, Javier; López, Ramón; Gimeno, Cristina; Catota, Marlon; Muñoz, Amalia

    2016-04-01

    In urban areas, air pollution from traffic is becoming a growing problem. In recent years the use of titanium dioxide (TiO2) based photocatalytic self-cleaning and de-polluting materials has been considered to remove these pollutants. TiO2 is now commercially available and used in construction material or paints for environmental purposes. Further work, however, is still required to clarify the potential impacts from wider TiO2 use. Specific test conditions are required to provide objective and accurate knowledge. Under the LIFE PHOTOCITYTEX project, the effectiveness of using TiO2-based photocatalytic nanomaterials in building textiles as a way of improving the air quality in urban areas will be assessed. Moreover, information on secondary products formed during the tests will be obtained, yielding a better overall understanding of the whole process and its implications. For this purpose, a series of demonstrations are foreseen, comprising 1. lab-test and development of textile prototypes at lab scale, 2. larger scale demonstration of the use of photocatalytic textiles in the depollution of urban environments employing the EUPHORE chambers to simulate a number of environmental conditions of various European cities and 3. field demonstrations installing the photocatalytic textiles in two urban locations in Quart de Poblet, a tunnel and a school. A one-year extensive passive dosimetric campaign has already being carried out to characterize the selected urban sites before the installation of the photocatalytic textile prototypes, and a similar campaign after their installation is ongoing. Also, more comprehensive intensive active measurement campaigns have been conducted to account for winter and summer conditions. In parallel, lab-tests have already been completed to determine optimal photocatalytic formulations on textiles, followed by experiments at EUPHORE. Information on the deployment of the campaigns is given together with laboratory conclusions and first

  15. High performance Si immersion gratings patterned with electron beam lithography

    Science.gov (United States)

    Gully-Santiago, Michael A.; Jaffe, Daniel T.; Brooks, Cynthia B.; Wilson, Daniel W.; Muller, Richard E.

    2014-07-01

    Infrared spectrographs employing silicon immersion gratings can be significantly more compact than spectro- graphs using front-surface gratings. The Si gratings can also offer continuous wavelength coverage at high spectral resolution. The grooves in Si gratings are made with semiconductor lithography techniques, to date almost entirely using contact mask photolithography. Planned near-infrared astronomical spectrographs require either finer groove pitches or higher positional accuracy than standard UV contact mask photolithography can reach. A collaboration between the University of Texas at Austin Silicon Diffractive Optics Group and the Jet Propulsion Laboratory Microdevices Laboratory has experimented with direct writing silicon immersion grating grooves with electron beam lithography. The patterning process involves depositing positive e-beam resist on 1 to 30 mm thick, 100 mm diameter monolithic crystalline silicon substrates. We then use the facility JEOL 9300FS e-beam writer at JPL to produce the linear pattern that defines the gratings. There are three key challenges to produce high-performance e-beam written silicon immersion gratings. (1) E- beam field and subfield stitching boundaries cause periodic cross-hatch structures along the grating grooves. The structures manifest themselves as spectral and spatial dimension ghosts in the diffraction limited point spread function (PSF) of the diffraction grating. In this paper, we show that the effects of e-beam field boundaries must be mitigated. We have significantly reduced ghost power with only minor increases in write time by using four or more field sizes of less than 500 μm. (2) The finite e-beam stage drift and run-out error cause large-scale structure in the wavefront error. We deal with this problem by applying a mark detection loop to check for and correct out minuscule stage drifts. We measure the level and direction of stage drift and show that mark detection reduces peak-to-valley wavefront error

  16. A Framework to Manage through Control and Automation a semester long student Project assignment in e-Learning Environment

    OpenAIRE

    Chaumun, Mamade Ajmal

    2013-01-01

    Managing semester-long project assignments is not always an easy task since teachers need to keep track of many elements of the project that will reflect in a proper assessment of the students’ work. Integrating an LMS into the educational process and therefore to assign, track, and assess the project may add to the complication, this can be very challenging and especially when students work in groups. Students expect support and guidance from teachers in all stages of the project...

  17. Mask characterization for CDU budget breakdown in advanced EUV lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  18. Evaluation of EUV resist performance using interference lithography

    Science.gov (United States)

    Buitrago, E.; Yildirim, O.; Verspaget, C.; Tsugama, N.; Hoefnagels, R.; Rispens, G.; Ekinci, Y.

    2015-03-01

    Extreme ultraviolet lithography (EUVL) stands as the most promising solution for the fabrication of future technology nodes in the semiconductor industry. Nonetheless, the successful introduction of EUVL into the extremely competitive and stringent high-volume manufacturing (HVM) phase remains uncertain partly because of the still limiting performance of EUV resists below 16 nm half-pitch (HP) resolution. Particularly, there exists a trade-off relationship between resolution (half-pitch), sensitivity (dose) and line-edge roughness (LER) that can be achieved with existing materials. This trade-off ultimately hampers their performance and extendibility towards future technology nodes. Here we present a comparative study of highly promising chemically amplified resists (CARs) that have been evaluated using the EUV interference lithography (EUV-IL) tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). In this study we have focused on the performance qualification of different resists mainly for 18 nm and 16 nm half-pitch line/space resolution (L/S = 1:1). Among the most promising candidates tested, there are a few choices that allow for 16 nm HP resolution to be achieved with high exposure latitude (up to ~ 33%), low LER (down to 3.3 nm or ~ 20% of critical dimension CD) and low dose-to-size (or best-energy, BE) < 41 mJ/cm2 values. Patterning was even demonstrated down to 12 nm HP with one of CARs (R1UL1) evaluated for their extendibility beyond the 16 nm HP resolution. 11 nm HP patterning with some pattern collapse and well resolved patterns down 12 nm were also demonstrated with another CAR (R15UL1) formulated for 16 nm HP resolution and below. With such resist it was possible even to obtain a small process window for 14 nm HP processing with an EL ~ 8% (BE ~ 37 mJ/cm2, LER ~ 4.5 nm). Though encouraging, fulfilling all of the requirements necessary for high volume production, such as high resolution, low LER, high photon

  19. High throughput nanoimprint lithography for semiconductor memory applications

    Science.gov (United States)

    Ye, Zhengmao; Zhang, Wei; Khusnatdinov, Niyaz; Stachowiak, Tim; Irving, J. W.; Longsine, Whitney; Traub, Matthew; Fletcher, Brian; Liu, Weijun

    2017-03-01

    Imprint lithography is a promising technology for replication of nano-scale features. For semiconductor device applications, Canon deposits a low viscosity resist on a field by field basis using jetting technology. A patterned mask is lowered into the resist fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are two critical components to meeting throughput requirements for imprint lithography. Using a similar approach to what is already done for many deposition and etch processes, imprint stations can be clustered to enhance throughput. The FPA-1200NZ2C is a four station cluster system designed for high volume manufacturing. For a single station, throughput includes overhead, resist dispense, resist fill time (or spread time), exposure and separation. Resist exposure time and mask/wafer separation are well understood processing steps with typical durations on the order of 0.10 to 0.20 seconds. To achieve a total process throughput of 17 wafers per hour (wph) for a single station, it is necessary to complete the fluid fill step in 1.2 seconds. For a throughput of 20 wph, fill time must be reduced to only one 1.1 seconds. There are several parameters that can impact resist filling. Key parameters include resist drop volume (smaller is better), system controls (which address drop spreading after jetting), Design for Imprint or DFI (to accelerate drop spreading) and material engineering (to promote wetting between the resist and underlying adhesion layer). In addition, it is mandatory to maintain fast filling, even for edge field imprinting. In this paper, we address the improvements made in all of these parameters to first enable a 1.20 second filling process for a device like pattern and have demonstrated this capability for both full fields and edge fields. Non

  20. Digital image management project for dermatological health care environments: a new dedicated software and review of the literature.

    Science.gov (United States)

    Rubegni, Pietro; Nami, Niccolò; Poggiali, Sara; Tataranno, Domenico; Fimiani, M

    2009-05-01

    Because the skin is the only organ completely accessible to visual examination, digital technology has therefore attracted the attention of dermatologists for documenting, monitoring, measuring and classifying morphological manifestations. To describe a digital image management system dedicated to dermatological health care environments and to compare it with other existing softwares for digital image storage. We designed a reliable hardware structure that could ensure future scaling, because storage needs tend to grow exponentially. For the software, we chose a client-web server application based on a relational database and with a 'minimalist' user interface. We developed a software with a ready-made, adaptable index of skin pathologies. It facilitates classification by pathology, patient and visit, with an advanced search option allowing access to all images according to personalized criteria. The software also offers the possibility of comparing two or more digital images (follow-up). The fact that the archives of years of digital photos acquired and saved on PCs can easily be entered in the program distinguishes it from the others in the market. This option is fundamental for accessing all the photos taken in years of practice in the program without entering them one by one. The program is available to any user connected to the local Intranet and the system may directly be available in the future from the Internet. All clinics and surgeries, especially those that rely on digital images, are obliged to keep up with technological advances. It is therefore hoped that our project will become a model for medical structures intending to rationalise digital and other data according to statutory requirements.

  1. Impact of the Three Gorges project on ecological environment changes and snail distribution in Dongting Lake area.

    Directory of Open Access Journals (Sweden)

    Feiyue Li

    2017-07-01

    Full Text Available The Three Gorges Dam (TGD is a remarkable, far-reaching project in China. This study was conducted to assess the impact of TGD on changes in the ecological environment, snail distribution and schistosomiasis transmission in Dongting Lake area.Hydrological data were collected from 12 monitoring sites in Hunan section of Yangtze River before and after TGD was established. Data on snail distribution and human schistosomiasis infection were also collected. Correlation analyses were performed to detect the significance of snail distribution to changes in ecological environmental factors and human schistosomiasis infection.A series of ecological environmental factors have changed in Dongting Lake area following the operation of TGD. Volume of annual runoff discharged into Dongting Lake declined by 20.85%. Annual sediment volume discharged into the lake and the mean lake sedimentation rate decreased by 73.9% and 32.2%, respectively. From 2003 to 2015, occurrence rate of frames with living snails and mean density of living snails decreased overall by 82.43% and 94.35%, respectively, with annual decrements being 13.49% and 21.29%. Moreover, human infection rate of schistosomiasis had decreased from 3.38% in 2003 to 0.44% in 2015, with a reduction of 86.98%. Correlation analyses showed that mean density of living snails was significantly associated with water level (r = 0.588, p<0.001, as well as the mean elevation range of the bottomland (r = 0.374, p = 0.025 and infection rate of schistosomiasis (r = 0.865, p<0.001.Ecological environmental changes caused by the TGD were associated with distribution of snails, and might further affect the transmission and prevalence of schistosomiasis. Risk of schistosomiasis transmission still exists in Dongting Lake area and long-term monitoring is required.

  2. Use of mycorrhizal fungi for the phyto stabilisation of radio contaminated environment (European project myrrh): overview on the scientific achievements

    Energy Technology Data Exchange (ETDEWEB)

    Dupre De Boulois, H.; Leyval, C.; Joner, E.J.; Jakobsen, I.; Chen, B.; Roos, P.; Thiry, I.; Rufyikiri, G.; Delvaux, B.; Declerck, S. [Universite catholique de Louvain, Mycotheque de l' Universite catholique de Louvain (MUCL), Unite de Microbiologie, Louvain-la-Neuve (Belgium)

    2004-07-01

    Because plants significantly affect radionuclides (RN) cycling and further dispersion into the biosphere, it is important to understand the biological factors influencing RN plant uptake, accumulation and redistribution. In this respect, mycorrhizal fungi which are intimately associated with plant roots and constitute an active continuum at the soil-plant interface are of particular interest. The European project MYRRH (Use of Mycorrhizal fungi for the phyto-stabilisation of radio-contaminated environment) was aimed to highlight the role of these soil micro-organisms. Both ectomycorrhizal (ECM) and arbuscular mycorrhizal (AM) fungi were considered and experiments were performed using naturally or artificially contaminated substrates with radiocaesium (Cs) or uranium (U) under pot culture or in vitro conditions. Results obtained under in vitro conditions demonstrated that AM fungal hyphae could take up and trans-locate Cs and U towards roots. However, this translocation was low for both elements. In particular, for Cs, uptake and translocation were not even perceptible using a classical pot culture system, but these contrasting results should be related to the growth conditions (e.g. concentration of potassium) used. The efficiency of translocation (rate of translocation per unit area) of both elements under in vitro conditions was higher than the one of roots. The in vitro studies also showed that the intra-radical AM fungal structures might contribute to Cs and U accumulation within mycorrhizal roots. Under pot culture conditions, AM fungi appeared to significantly reduce root to shoot translocation of U. Under the same conditions, ECM transport of Cs was demonstrated, and appeared to be dependent on the fungal species. As we established that mycorrhizal fungi could influence RN plant acquisition, accumulation and redistribution, a better estimation of the potential use of mycorrhizal fungi for the phyto-remediation of RN-contaminated areas is now available and

  3. Use of mycorrhizal fungi for the phyto stabilisation of radio contaminated environment (European project myrrh): overview on the scientific achievements

    International Nuclear Information System (INIS)

    Dupre De Boulois, H.; Leyval, C.; Joner, E.J.; Jakobsen, I.; Chen, B.; Roos, P.; Thiry, I.; Rufyikiri, G.; Delvaux, B.; Declerck, S.

    2004-01-01

    Because plants significantly affect radionuclides (RN) cycling and further dispersion into the biosphere, it is important to understand the biological factors influencing RN plant uptake, accumulation and redistribution. In this respect, mycorrhizal fungi which are intimately associated with plant roots and constitute an active continuum at the soil-plant interface are of particular interest. The European project MYRRH (Use of Mycorrhizal fungi for the phyto-stabilisation of radio-contaminated environment) was aimed to highlight the role of these soil micro-organisms. Both ectomycorrhizal (ECM) and arbuscular mycorrhizal (AM) fungi were considered and experiments were performed using naturally or artificially contaminated substrates with radiocaesium (Cs) or uranium (U) under pot culture or in vitro conditions. Results obtained under in vitro conditions demonstrated that AM fungal hyphae could take up and trans-locate Cs and U towards roots. However, this translocation was low for both elements. In particular, for Cs, uptake and translocation were not even perceptible using a classical pot culture system, but these contrasting results should be related to the growth conditions (e.g. concentration of potassium) used. The efficiency of translocation (rate of translocation per unit area) of both elements under in vitro conditions was higher than the one of roots. The in vitro studies also showed that the intra-radical AM fungal structures might contribute to Cs and U accumulation within mycorrhizal roots. Under pot culture conditions, AM fungi appeared to significantly reduce root to shoot translocation of U. Under the same conditions, ECM transport of Cs was demonstrated, and appeared to be dependent on the fungal species. As we established that mycorrhizal fungi could influence RN plant acquisition, accumulation and redistribution, a better estimation of the potential use of mycorrhizal fungi for the phyto-remediation of RN-contaminated areas is now available and

  4. Post-Fire Recovery of Eco-Hydrologic Behavior Given Historic and Projected Climate Variability in California Mediterranean Type Environments

    Science.gov (United States)

    Seaby, L. P.; Tague, C. L.; Hope, A. S.

    2006-12-01

    The Mediterranean type environments (MTEs) of California are characterized by a distinct wet and dry season and high variability in inter-annual climate. Water limitation in MTEs makes eco-hydrological processes highly sensitive to both climate variability and frequent fire disturbance. This research modeled post-fire eco- hydrologic behavior under historical and moderate and extreme scenarios of future climate in a semi-arid chaparral dominated southern California MTE. We used a physically-based, spatially-distributed, eco- hydrological model (RHESSys - Regional Hydro-Ecologic Simulation System), to capture linkages between water and vegetation response to the combined effects of fire and historic and future climate variability. We found post-fire eco-hydrologic behavior to be strongly influenced by the episodic nature of MTE climate, which intensifies under projected climate change. Higher rates of post-fire net primary productivity were found under moderate climate change, while more extreme climate change produced water stressed conditions which were less favorable for vegetation productivity. Precipitation variability in the historic record follows the El Niño Southern Oscillation (ENSO) and the Pacific Decadal Oscillation (PDO), and these inter-annual climate characteristics intensify under climate change. Inter-annual variation in streamflow follows these precipitation patterns. Post-fire streamflow and carbon cycling trajectories are strongly dependent on climate characteristics during the first 5 years following fire, and historic intra-climate variability during this period tends to overwhelm longer term trends and variation that might be attributable to climate change. Results have implications for water resource availability, vegetation type conversion from shrubs to grassland, and changes in ecosystem structure and function.

  5. WIRE project- Soil water repellence in biodiverse semi arid environments: new insights and implications for ecological restoration

    Science.gov (United States)

    Muñoz-Rojas, Miriam; Jiménez-Morillo, Nicasio T.; Jordan, Antonio; Zavala, Lorena M.; Stevens, Jason; González-Pérez, Jose Antonio

    2017-04-01

    Background Soil water repellency (SWR) can have a critical effect on the restoration of disturbed ecosystems causing poor plant establishment and promoting erosion processes. Although SWR has been reported in most continents of the world for different soil types, climate conditions and land uses, there are still many research gaps in the knowledge of its causes and controlling factors (Doerr et al.,2000; Jordan et al., 2013), particularly in Mediterranean arid semi arid environments which are largely affected by this phenomenon. The WIRE project aims to investigate SWR in soils under different vegetation types of dominant biodiverse ecosystems of Western Australia (WA), e.g. hummock grasslands and Banksia woodlands, as well as characterizing organic compounds that induce hydrophobicity in these soils. Banksia woodlands (BW) are of particular interest in this project. These are iconic ecosystems of WA composed by an overstorey dominated by Proteaceae that are threatened by sand mining activities and urban expansion. Conservation and restoration of these woodlands are critical but despite considerable efforts to restore these areas, the success of current rehabilitation programs is poor due to the high sensitivity of the ecosystem to drought stress and the disruption of water dynamics in mature BW soils that result in low seedling survival rates (5-30%). The main objectives of this collaborative research are: i) to identify SWR intensity and severity under different vegetation types and evaluate controlling factors in both hummock grasslands and BW (ii) to characterize hydrophobic compounds in soils using analytical pyrolysis techniques and iii) to investigate the impact of SWR on water economy in relation with soil functioning and plant strategies for water uptake in pristine BW. Methods In a series of field trials and experimental studies, we measured SWR of soil samples under lab conditions in oven-dry samples (48 h, 105 °C) that were previously collected under

  6. Progress in coherent lithography using table-top extreme ultraviolet lasers

    Science.gov (United States)

    Li, Wei

    Nanotechnology has drawn a wide variety of attention as interesting phenomena occurs when the dimension of the structures is in the nanometer scale. The particular characteristics of nanoscale structures had enabled new applications in different fields in science and technology. Our capability to fabricate these nanostructures routinely for sure will impact the advancement of nanoscience. Apart from the high volume manufacturing in semiconductor industry, a small-scale but reliable nanofabrication tool can dramatically help the research in the field of nanotechnology. This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief review of the main characteristics of table-top EUV lasers will be addressed concentrating on its high power and large coherence radius that enable the lithography application described herein. The development of a Talbot EUV lithography system which is capable of printing 50nm half pitch nanopatterns will be illustrated in chapter III. A detailed discussion of its resolution limit will be presented followed by the development of X-Y-Z positioning stage, the fabrication protocol for diffractive EUV mask, and the pattern transfer using self- developed ion beam etching, and the dose control unit. In addition, this dissertation demonstrated the capability to fabricate functional periodic nanostructures using Talbot EUV lithography. After that, resolution enhancement techniques like multiple exposure, displacement Talbot EUV lithography, fractional Talbot EUV lithography, and Talbot lithography using 18.9nm amplified spontaneous emission laser will be demonstrated. Chapter IV will describe a hybrid EUV lithography which combines the Talbot imaging and interference lithography rendering a high resolution

  7. Flexible and disposable plasmonic refractive index sensor using nanoimprint lithography

    Science.gov (United States)

    Mohapatra, Saswat; Moirangthem, Rakesh S.

    2018-03-01

    Nanostructure based plasmonic sensors are highly demanding in various areas due to their label-free and real-time detection capability. In this work, we developed an inexpensive flexible plasmonic sensor using optical disc nanograting via soft UV-nanoimprint lithography (UV-NIL). The polydimethylsiloxane (PDMS) stamp was used to transfer the nanograting structure from digital versatile discs (DVDs) to flexible and transparent polyethylene terephthalate (PET) substrate. Further, the plasmonic sensing substrate was obtained after coating a gold thin film on the top of the imprinted sample. The surface plasmon resonance (SPR) modes excited on gold coated nanograting structure appeared as a dip in the reflectance spectra measured at normal incident of white light in ambient air medium. Electromagnetic simulation based on finite element method (FEM) was used to understand and analyze the excited SPR modes and it is a very close agreement with the experimental results. The bulk refractive index (RI) sensing was performed by the sensor chip using water-glycerol mixture with different concentrations. Experimentally, the bulk RI sensitivity was found to be 797+/-17 nm/RIU.

  8. An assessment of the process capabilities of nanoimprint lithography

    Science.gov (United States)

    Balla, Tobias; Spearing, S. Mark; Monk, Andrew

    2008-09-01

    Nanoimprint lithography (NIL) is an emerging nanofabrication tool, able to replicate imprint patterns quickly and at high volumes. The present study was performed in order to define the capabilities of NIL, based on a study of published research and to identify the application areas where NIL has the greatest potential. The process attributes of different NIL process chains were analysed, and their process capabilities were compared to identify trends and process limitations. The attributes chosen include the line width, relief height, initial resist thickness, residual layer thickness, imprint area and line width tolerances. In each case well-defined limits can be identified, which are a direct result of the mechanisms involved in the NIL process. These quantitative results were compared with the assessments of individuals in academia and within the microfabrication industry. The results suggest NIL is most suited to producing photonic, microfluidic and patterned media applications, with photonic applications the closest to market. NIL needs to address overlay alignment issues for wider use, while an analysis is needed for each market, as to whether NIL adds value.

  9. Thermo-curable epoxy systems for nanoimprint lithography

    International Nuclear Information System (INIS)

    Wu, Chun-Chang; Hsu, Steve Lien-Chung

    2010-01-01

    In this work, we have used solvent-free thermo-curable epoxy systems for low-pressure and moderate-temperature nanoimprint lithography (NIL). The curing kinetic parameters and conversion of diglycidyl ether of bisphenol A (DGEBA) resin with different ambient-cure 930 and 954 hardeners were studied by the isothermal DSC technique. They are useful for the study of epoxy resins in the imprinting application. The DGEBA/930 and DGEBA/954 epoxy resists can be imprinted to obtain high-density nano- and micro-scale patterns on a flexible indium tin oxide/poly(ethylene terephthalate) (ITO/PET) substrate. The DGEBA/930 epoxy resin is not only suitable for resist material, but also for plastic mold material. Highly dense nanometer patterns can be successfully imprinted using a UV-curable resist from the DGEBA/930 epoxy mold. Using the replicated DGEBA/930 epoxy mold instead of the expensive master can prevent brittle failure of the silicon molds in the NIL

  10. Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

    Energy Technology Data Exchange (ETDEWEB)

    DeVetter, Brent M.; Bernacki, Bruce E.; Bennett, Wendy D.; Schemer-Kohrn, Alan; Alvine, Kyle J.

    2017-01-01

    Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing in combination with new nanofabrication techniques. A plasmon is a quantum of charge density oscillation that lends nanoscale metals such as gold and silver unique optical properties. In particular, gold and silver nanoparticles exhibit localized surface plasmon resonances—collective charge density oscillations on the surface of the nanoparticle—in the visible spectrum. Here, we focus on the fabrication of periodic arrays of anisotropic plasmonic nanostructures. These half-shell (or nanocup) structures can exhibit additional unique light-bending and polarization dependent optical properties that simple isotropic nanostructures cannot. Researchers are interested in the fabrication of periodic arrays of nanocups for a wide variety of applications such as low-cost optical devices, surface-enhanced Raman scattering, and tamper indication. We present a scalable technique based on colloidal lithography in which it is possible to easily fabricate large periodic arrays of nanocups using spin-coating and self-assembled commercially available polymeric nanospheres. Electron microscopy and optical spectroscopy from the visible to near-IR was performed to confirm successful nanocup fabrication. We conclude with a demonstration of the transfer of nanocups to a flexible, conformal adhesive film.

  11. Scanning probe lithography for fabrication of Ti metal nanodot arrays

    International Nuclear Information System (INIS)

    Jung, B.; Jo, W.; Gwon, M.J.; Lee, E.; Kim, D.-W.

    2010-01-01

    We report fabrication of Ti metal nanodot arrays by scanning probe microscopic indentation. A thin poly-methylmethacrylate (PMMA) layer was spin-coated on Si substrates with thickness of 70 nm. Nanometer-size pore arrays were formed by indenting the PMMA layer using a cantilever of a scanning probe microscope. Protuberances with irregular boundaries appeared during the indentation process. Control of approach and pulling-out speed during indentation was able to dispose of the protrusions. Ti metal films were deposited on the patterned PMMA layers by a radio-frequency sputtering method and subsequently lifted off to obtain metal nanodot arrays. The fabricated metal nanodot arrays have 200 nm of diameter and 500 nm of interdistance, which corresponds to a density of 4x10 8 /cm 2 . Scanning probe-based measurement of current-voltage (I-V) behaviors for a single Ti metal nanodot showed asymmetric characteristics. Applying external bias is likely to induce oxidation of Ti metal, since the conductance decreased and volume change of the dots was observed. I-V behaviors of Ti metal nanodots by conventional e-beam lithography were also characterized for comparison.

  12. Alternative stitching method for massively parallel e-beam lithography

    Science.gov (United States)

    Brandt, Pieter; Tranquillin, Céline; Wieland, Marco; Bayle, Sébastien; Milléquant, Matthieu; Renault, Guillaume

    2015-07-01

    In this study, a stitching method other than soft edge (SE) and smart boundary (SB) is introduced and benchmarked against SE. The method is based on locally enhanced exposure latitude without throughput cost, making use of the fact that the two beams that pass through the stitching region can deposit up to 2× the nominal dose. The method requires a complex proximity effect correction that takes a preset stitching dose profile into account. Although the principle of the presented stitching method can be multibeam (lithography) systems in general, in this study, the MAPPER FLX 1200 tool is specifically considered. For the latter tool at a metal clip at minimum half-pitch of 32 nm, the stitching method effectively mitigates beam-to-beam (B2B) position errors such that they do not induce an increase in critical dimension uniformity (CDU). In other words, the same CDU can be realized inside the stitching region as outside the stitching region. For the SE method, the CDU inside is 0.3 nm higher than outside the stitching region. A 5-nm direct overlay impact from the B2B position errors cannot be reduced by a stitching strategy.

  13. 100-nm gate lithography for double-gate transistors

    Science.gov (United States)

    Krasnoperova, Azalia A.; Zhang, Ying; Babich, Inna V.; Treichler, John; Yoon, Jung H.; Guarini, Kathryn; Solomon, Paul M.

    2001-09-01

    The double gate field effect transistor (FET) is an exploratory device that promises certain performance advantages compared to traditional CMOS FETs. It can be scaled down further than the traditional devices because of the greater electrostatic control by the gates on the channel (about twice as short a channel length for the same gate oxide thickness), has steeper sub-threshold slope and about double the current for the same width. This paper presents lithographic results for double gate FET's developed at IBM's T. J. Watson Research Center. The device is built on bonded wafers with top and bottom gates self-aligned to each other. The channel is sandwiched between the top and bottom polysilicon gates and the gate length is defined using DUV lithography. An alternating phase shift mask was used to pattern gates with critical dimensions of 75 nm, 100 nm and 125 nm in photoresist. 50 nm gates in photoresist have also been patterned by 20% over-exposure of nominal 100 nm lines. No trim mask was needed because of a specific way the device was laid out. UV110 photoresist from Shipley on AR-3 antireflective layer were used. Process windows, developed and etched patterns are presented.

  14. Selective hierarchical patterning of silicon nanostructures via soft nanostencil lithography.

    Science.gov (United States)

    Du, Ke; Ding, Junjun; Wathuthanthri, Ishan; Choi, Chang-Hwan

    2017-11-17

    It is challenging to hierarchically pattern high-aspect-ratio nanostructures on microstructures using conventional lithographic techniques, where photoresist (PR) film is not able to uniformly cover on the microstructures as the aspect ratio increases. Such non-uniformity causes poor definition of nanopatterns over the microstructures. Nanostencil lithography can provide an alternative means to hierarchically construct nanostructures on microstructures via direct deposition or plasma etching through a free-standing nanoporous membrane. In this work, we demonstrate the multiscale hierarchical fabrication of high-aspect-ratio nanostructures on microstructures of silicon using a free-standing nanostencil, which is a nanoporous membrane consisting of metal (Cr), PR, and anti-reflective coating. The nanostencil membrane is used as a deposition mask to define Cr nanodot patterns on the predefined silicon microstructures. Then, deep reactive ion etching is used to hierarchically create nanostructures on the microstructures using the Cr nanodots as an etch mask. With simple modification of the main fabrication processes, high-aspect-ratio nanopillars are selectively defined only on top of the microstructures, on bottom, or on both top and bottom.

  15. Microintaglio Printing for Soft Lithography-Based in Situ Microarrays

    Directory of Open Access Journals (Sweden)

    Manish Biyani

    2015-07-01

    Full Text Available Advances in lithographic approaches to fabricating bio-microarrays have been extensively explored over the last two decades. However, the need for pattern flexibility, a high density, a high resolution, affordability and on-demand fabrication is promoting the development of unconventional routes for microarray fabrication. This review highlights the development and uses of a new molecular lithography approach, called “microintaglio printing technology”, for large-scale bio-microarray fabrication using a microreactor array (µRA-based chip consisting of uniformly-arranged, femtoliter-size µRA molds. In this method, a single-molecule-amplified DNA microarray pattern is self-assembled onto a µRA mold and subsequently converted into a messenger RNA or protein microarray pattern by simultaneously producing and transferring (immobilizing a messenger RNA or a protein from a µRA mold to a glass surface. Microintaglio printing allows the self-assembly and patterning of in situ-synthesized biomolecules into high-density (kilo-giga-density, ordered arrays on a chip surface with µm-order precision. This holistic aim, which is difficult to achieve using conventional printing and microarray approaches, is expected to revolutionize and reshape proteomics. This review is not written comprehensively, but rather substantively, highlighting the versatility of microintaglio printing for developing a prerequisite platform for microarray technology for the postgenomic era.

  16. Epitaxial patterning of thin-films: conventional lithographies and beyond

    International Nuclear Information System (INIS)

    Zhang, Wei; Krishnan, Kannan M

    2014-01-01

    Thin-film based novel magnetic and electronic devices have entered a new era in which the film crystallography, structural coherence, and epitaxy play important roles in determining their functional properties. The capabilities of controlling such structural and functional properties are being continuously developed by various physical deposition technologies. Epitaxial patterning strategies further allow the miniaturization of such novel devices, which incorporates thin-film components into nanoscale architectures while keeping their functional properties unmodified from their ideal single-crystal values. In the past decade, epitaxial patterning methods on the laboratory scale have been reported to meet distinct scientific inquires, in which the techniques and processes used differ from one to the other. In this review we summarize many of these pioneering endeavors in epitaxial patterning of thin-film devices that use both conventional and novel lithography techniques. These methods demonstrate epitaxial patterning for a broad range of materials (metals, oxides, and semiconductors) and cover common device length scales from micrometer to sub-hundred nanometer. Whilst we have been motivated by magnetic materials and devices, we present our outlook on developing systematic-strategies for epitaxial patterning of functional materials which will pave the road for the design, discovery and industrialization of next-generation advanced magnetic and electronic nano-devices. (topical review)

  17. Synchrotron Radiation Lithography for Manufacturing Integrated Circuits Beyond 100 nm.

    Science.gov (United States)

    Kinoshita, H; Watanabe, T; Niibe, M

    1998-05-01

    Extreme ultraviolet lithography is a powerful tool for printing features of 0.1 micro m and below; in Japan and the USA there is a growing tendency to view it as the wave of the future. With Schwarzschild optics, replication of a 0.05 micro m pattern has been demonstrated in a 25 micro m square area. With a two-aspherical-mirror system, a 0.15 micro m pattern has been replicated in a ring slit area of 20 mm x 0.4 mm; a combination of this system with illumination optics and synchronized mask and wafer stages has enabled the replication of a 0.15 micro m pattern in an area of 10 mm x 12.5 mm. Furthermore, in the USA, the Sandia National Laboratory has succeeded in fabricating a fully operational NMOS transistor with a gate length of 0.1 micro m. The most challenging problem is the fabrication of mirrors with the required figure error of 0.28 nm. However, owing to advances in measurement technology, mirrors can now be made to a precision that almost satisfies this requirement. Therefore, it is time to move into a rapid development phase in order to obtain a system ready for practical use by the year 2004. In this paper the status of individual technologies is discussed in light of this situation, and future requirements for developing a practical system are considered.

  18. Development of procedures for programmable proximity aperture lithography

    Energy Technology Data Exchange (ETDEWEB)

    Whitlow, H.J., E-mail: harry.whitlow@he-arc.ch [Institut des Microtechnologies Appliquées Arc, Haute Ecole Arc Ingénierie, Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä (Finland); Gorelick, S. [VTT Technical Research Centre of Finland, P.O. Box 1000, Tietotie 3, Espoo, FI-02044 VTT (Finland); Puttaraksa, N. [Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä (Finland); Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Napari, M.; Hokkanen, M.J.; Norarat, R. [Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FI-40014 Jyväskylä (Finland)

    2013-07-01

    Programmable proximity aperture lithography (PPAL) with MeV ions has been used in Jyväskylä and Chiang Mai universities for a number of years. Here we describe a number of innovations and procedures that have been incorporated into the LabView-based software. The basic operation involves the coordination of the beam blanker and five motor-actuated translators with high accuracy, close to the minimum step size with proper anti-collision algorithms. By using special approaches, such writing calibration patterns, linearisation of position and careful backlash correction the absolute accuracy of the aperture size and position, can be improved beyond the standard afforded by the repeatability of the translator end-point switches. Another area of consideration has been the fluence control procedures. These involve control of the uniformity of the beam where different approaches for fluence measurement such as simultaneous aperture current and the ion current passing through the aperture using a Faraday cup are used. Microfluidic patterns may contain many elements that make-up mixing sections, reaction chambers, separation columns and fluid reservoirs. To facilitate conception and planning we have implemented a .svg file interpreter, that allows the use of scalable vector graphics files produced by standard drawing software for generation of patterns made up of rectangular elements.

  19. Multifunctional guest-host particles engineered by reversal nanoimprint lithography

    Science.gov (United States)

    Ha, Uh-Myong; Kaban, Burhan; Tomita, Andreea; Krekić, Kristijan; Klintuch, Dieter; Pietschnig, Rudolf; Ehresmann, Arno; Holzinger, Dennis; Hillmer, Hartmut

    2018-03-01

    Particulate polymeric microfibers with incorporated europium(III)oxide (Eu2O3) nanoparticles were introduced as a magneto-photoluminescent multifunctional material fabricated via reversal nanoimprint lithography. To specifically address the volume properties of these guest-host particles, the guest, Eu2O3, was milled down to an average particle size of 350 nm in diameter and mixed with the host-polymer, AMONIL®, before in situ hardening in the imprint stamp. The variation of the fabrication process parameters, i.e. delay time, spin coating speed, as well as the concentration of Eu2O3 nanoparticles was proven to have a significant impact on both the structure quality and the stamp release of the microfibers with respect to the formation of a thinner residual layer. Structural characterization performed by SEM revealed optimum fabrication process parameters for a homogeneous spatial distribution of Eu2O3 nanoparticles within the microfibers while simultaneously avoiding the formation of undesired agglomerates. The magneto-photoluminescent properties of Eu2O3 nanoparticles, i.e. a red emission at 613 nm and a paramagnetic response, were found to be superimposed to the optic and the diamagnetic behaviors of AMONIL®. The results imply that guest-host interdependence of these properties can be excluded and that the suggested technique enables for specific tailoring of particulate multifunctional materials with focus on their volume properties.

  20. Fluid management in roll-to-roll nanoimprint lithography

    Science.gov (United States)

    Jain, A.; Bonnecaze, R. T.

    2013-06-01

    The key process parameters of UV roll-to-roll nanoimprint lithography are identified from an analysis of the fluid, curing, and peeling dynamics. The process includes merging of droplets of imprint material, curing of the imprint material from a viscous liquid to elastic solid resist, and pattern replication and detachment of the resist from template. The time and distances on the web or rigid substrate over which these processes occur are determined as function of the physical properties of the uncured liquid, the cured solid, and the roller configuration. The upper convected Maxwell equation is used to model the viscoelastic liquid and to calculate the force on the substrate and the torque on the roller. The available exposure time is found to be the rate limiting parameter and it is O(√Rho /uo), where R is the radius of the roller, ho is minimum gap between the roller and web, and uo is the velocity of the web. The residual layer thickness of the resist should be larger than the gap between the roller and the substrate to ensure complete feature filling and optimal pattern replication. For lower residual layer thickness, the droplets may not merge to form a continuous film for pattern transfer.

  1. Fracture Toughness (KIC) of Lithography Based Manufactured Alumina Ceramic

    Science.gov (United States)

    Nindhia, T. G. T.; Schlacher, J.; Lube, T.

    2018-04-01

    Precision shaped ceramic components can be obtained by an emerging technique called Lithography based Ceramic Manufacturing (LCM). A green part is made from a slurry consisting of a ceramic powder in a photocurable binder with addition of dispersant and plasticizer. Components are built in a layer–by-layer way by exposing the desired cross- sections to light. The parts are subsequently sintered to their final density. It is a challenge to produce ceramic component with this method that yield the same mechanical properties in all direction. The fracture toughness (KIc) of of LCM-alumina (prepared at LITHOZ GmbH, Austria) was tested by using the Single-Edge-V-Notched Beam (SEVNB) method. Notches are made into prismatic bend-bars in all three direction X, Y and Z to recognize the value of fracture toughness of the material in all three directions. The microstructure was revealed with optical microscopy as well as Scanning Electron Microscopy (SEM). The results indicate that the fracture toughness in Y-direction has the highest value (3.10 MPam1/2) that is followed by the one in X-direction which is just a bit lower (2.90 MPam1/2). The Z-direction is found to have a similar fracture toughness (2.95 MPam1/2). This is supported by a homogeneous microstructure showing no hint of the layers used during production.

  2. Superhydrophobic hierarchical arrays fabricated by a scalable colloidal lithography approach.

    Science.gov (United States)

    Kothary, Pratik; Dou, Xuan; Fang, Yin; Gu, Zhuxiao; Leo, Sin-Yen; Jiang, Peng

    2017-02-01

    Here we report an unconventional colloidal lithography approach for fabricating a variety of periodic polymer nanostructures with tunable geometries and hydrophobic properties. Wafer-sized, double-layer, non-close-packed silica colloidal crystal embedded in a polymer matrix is first assembled by a scalable spin-coating technology. The unusual non-close-packed crystal structure combined with a thin polymer film separating the top and the bottom colloidal layers render great versatility in templating periodic nanostructures, including arrays of nanovoids, nanorings, and hierarchical nanovoids. These different geometries result in varied fractions of entrapped air in between the templated nanostructures, which in turn lead to different apparent water contact angles. Superhydrophobic surfaces with >150° water contact angles and <5° contact angle hysteresis are achieved on fluorosilane-modified polymer hierarchical nanovoid arrays with large fractions of entrapped air. The experimental contact angle measurements are complemented with theoretical predictions using the Cassie's model to gain insights into the fundamental microstructure-dewetting property relationships. The experimental and theoretical contact angles follow the same trends as determined by the unique hierarchical structures of the templated periodic arrays. Copyright © 2016 Elsevier Inc. All rights reserved.

  3. Study of nanoimprint lithography (NIL) for HVM of memory devices

    Science.gov (United States)

    Kono, Takuya; Hatano, Masayuki; Tokue, Hiroshi; Kobayashi, Kei; Suzuki, Masato; Fukuhara, Kazuya; Asano, Masafumi; Nakasugi, Tetsuro; Choi, Eun Hyuk; Jung, Wooyung

    2017-03-01

    A low cost alternative lithographic technology is desired to meet the decreasing feature size of semiconductor devices. Nano-imprint lithography (NIL) is one of the candidates for alternative lithographic technologies.[1][2][3] NIL has such advantages as good resolution, critical dimension (CD) uniformity and low line edge roughness (LER). On the other hand, the critical issues of NIL are defectivity, overlay, and throughput. In order to introduce NIL into the HVM, it is necessary to overcome these three challenges simultaneously.[4]-[12] In our previous study, we have reported a dramatic improvement in NIL process defectivity on a pilot line tool, FPA-1100 NZ2. We have described that the NIL process for 2x nm half pitch is getting closer to the target of HVM.[12] In this study, we report the recent evaluation of the NIL process performance to judge the applicability of NIL to memory device fabrications. In detail, the CD uniformity and LER are found to be less than 2nm. The overlay accuracy of the test device is less than 7nm. A defectivity level of below 1pcs./cm2 has been achieved at a throughput of 15 wafers per hour.

  4. THE PROACTIVE MANAGEMENT MODEL OF STRATEGIC DEVELOPMENT PROJECT ON THE ENERGY SUPPLY COMPANIES IN A TURBULENT ENVIRONMENT

    Directory of Open Access Journals (Sweden)

    Михайло Збишекович ДОМБРОВСЬКИЙ

    2017-03-01

    Full Text Available A methodical approach of proactive project management model with the estimate (prediction deviation of actual results from planned at each control step is proposed. Deviation of actual results from the project planned, which takes place in the management of the energy company transformation project, as a result of action under uncertainty, determines the acceleration of work over the project plan. Implementation the scope of work, which exceeds the plan, as result of overspending of resources and budget, disrupting the stability of the project as a system. The graphic model helps to form the "corridor" tolerance based resource reserve, and the implementation of the project work is carried out according to the extension concept. Clarification allowable deviation area allows improving the model of project proactive management for each of the next execution step. Project management quality is improved by reducing the time of decision-making and increase the sustainability and efficiency by substantially reducing deviations. The conclusions about the benefits of the assessment of works and project resources balance, by using the proactive management model, which allows comparing variants of works dynamics, to implement the search for the best solution to a predetermined set of admissible, have been made.

  5. Intregrating metallic wiring with three-dimensional polystyrene colloidal crystals using electron-beam lithography and three-dimensional laser lithography

    International Nuclear Information System (INIS)

    Tian, Yaolan; Isotalo, Tero J; Konttinen, Mikko P; Li, Jiawei; Heiskanen, Samuli; Geng, Zhuoran; Maasilta, Ilari J

    2017-01-01

    We demonstrate a method to fabricate narrow, down to a few micron wide metallic leads on top of a three-dimensional (3D) colloidal crystal self-assembled from polystyrene (PS) nanospheres of diameter 260 nm, using electron-beam lithography. This fabrication is not straightforward due to the fact that PS nanospheres cannot usually survive the harsh chemical treatments required in the development and lift-off steps of electron-beam lithography. We solve this problem by increasing the chemical resistance of the PS nanospheres using an additional electron-beam irradiation step, which allows the spheres to retain their shape and their self-assembled structure, even after baking to a temperature of 160 °C, the exposure to the resist developer and the exposure to acetone, all of which are required for the electron-beam lithography step. Moreover, we show that by depositing an aluminum oxide capping layer on top of the colloidal crystal after the e-beam irradiation, the surface is smooth enough so that continuous metal wiring can be deposited by the electron-beam lithography. Finally, we also demonstrate a way to self-assemble PS colloidal crystals into a microscale container, which was fabricated using direct-write 3D laser-lithography. Metallic wiring was also successfully integrated with the combination of a container structure and a PS colloidal crystal. Our goal is to make a device for studies of thermal transport in 3D phononic crystals, but other phononic or photonic crystal applications could also be envisioned. (paper)

  6. Quantitative analysis on the environmental impact of large-scale water transfer project on water resource area in a changing environment

    Directory of Open Access Journals (Sweden)

    D. H. Yan

    2012-08-01

    Full Text Available The interbasin long-distance water transfer project is key support for the reasonable allocation of water resources in a large-scale area, which can optimize the spatio-temporal change of water resources to secure the amount of water available. Large-scale water transfer projects have a deep influence on ecosystems; besides, global climate change causes uncertainty and additive effect of the environmental impact of water transfer projects. Therefore, how to assess the ecological and environmental impact of megaprojects in both construction and operation phases has triggered a lot of attention. The water-output area of the western route of China's South-North Water Transfer Project was taken as the study area of the present article. According to relevant evaluation principles and on the basis of background analysis, we identified the influencing factors and established the diagnostic index system. The climate-hydrology-ecology coupled simulation model was used to simulate and predict ecological and environmental responses of the water resource area in a changing environment. The emphasis of impact evaluation was placed on the reservoir construction and operation scheduling, representative river corridors and wetlands, natural reserves and the water environment below the dam sites. In the end, an overall evaluation of the comprehensive influence of the project was conducted. The research results were as follows: the environmental impacts of the western route project in the water resource area were concentrated on two aspects: the permanent destruction of vegetation during the phase of dam construction and river impoundment, and the significant influence on the hydrological situation of natural river corridor after the implementation of water extraction. The impact on local climate, vegetation ecology, typical wetlands, natural reserves and the water environment of river basins below the dam sites was small.

  7. Quantitative analysis on the environmental impact of large-scale water transfer project on water resource area in a changing environment

    Science.gov (United States)

    Yan, D. H.; Wang, H.; Li, H. H.; Wang, G.; Qin, T. L.; Wang, D. Y.; Wang, L. H.

    2012-08-01

    The interbasin long-distance water transfer project is key support for the reasonable allocation of water resources in a large-scale area, which can optimize the spatio-temporal change of water resources to secure the amount of water available. Large-scale water transfer projects have a deep influence on ecosystems; besides, global climate change causes uncertainty and additive effect of the environmental impact of water transfer projects. Therefore, how to assess the ecological and environmental impact of megaprojects in both construction and operation phases has triggered a lot of attention. The water-output area of the western route of China's South-North Water Transfer Project was taken as the study area of the present article. According to relevant evaluation principles and on the basis of background analysis, we identified the influencing factors and established the diagnostic index system. The climate-hydrology-ecology coupled simulation model was used to simulate and predict ecological and environmental responses of the water resource area in a changing environment. The emphasis of impact evaluation was placed on the reservoir construction and operation scheduling, representative river corridors and wetlands, natural reserves and the water environment below the dam sites. In the end, an overall evaluation of the comprehensive influence of the project was conducted. The research results were as follows: the environmental impacts of the western route project in the water resource area were concentrated on two aspects: the permanent destruction of vegetation during the phase of dam construction and river impoundment, and the significant influence on the hydrological situation of natural river corridor after the implementation of water extraction. The impact on local climate, vegetation ecology, typical wetlands, natural reserves and the water environment of river basins below the dam sites was small.

  8. Deliberated opinion of the Environment Authority concerning the prior definition of the Cigeo project, industrial centre of deep reversible storage of radioactive wastes in Meuse/Haute-Marne

    International Nuclear Information System (INIS)

    2013-01-01

    This document first describes the project and its context: history and legal framework, types of wastes dedicated to Cigeo, definition of the warehousing, storage, notions of reversibility and retrievability, project location, program for the installation, transport of wastes to Cigeo. It describes the associated administrative procedures: creation authorization request, and other procedures including an impact study. It recalls the questions asked by the ANDRA and gives the corresponding answers. These questions concern the perimeter of the impact study to be performed, dates and modalities of submission to the Environment Authority, scenarios to be presented in the impact study, definition of impact study areas, and impacts after installation closure

  9. Innovative Approaches To Educating Medical Students for Practice in a Changing Health Care Environment: The National UME-21 Project.

    Science.gov (United States)

    Rabinowitz, Howard K.; Babbott, David; Bastacky, Stanford; Pascoe, John M.; Patel, Kavita K.; Pye, Karen L.; Rodak, John, Jr.; Veit, Kenneth J.; Wood, Douglas L.

    2001-01-01

    Describes the major curriculum changes that have been implemented through Undergraduate Medical Education for the 21st Century (UME-21), a 3-year national demonstration project to encourage innovation in medical education. Discusses challenges that occurred in carrying out those changes, and outlines the strategies for evaluating the project. (EV)

  10. 3D workflow for HDR image capture of projection systems and objects for CAVE virtual environments authoring with wireless touch-sensitive devices

    Science.gov (United States)

    Prusten, Mark J.; McIntyre, Michelle; Landis, Marvin

    2006-02-01

    A 3D workflow pipeline is presented for High Dynamic Range (HDR) image capture of projected scenes or objects for presentation in CAVE virtual environments. The methods of HDR digital photography of environments vs. objects are reviewed. Samples of both types of virtual authoring being the actual CAVE environment and a sculpture are shown. A series of software tools are incorporated into a pipeline called CAVEPIPE, allowing for high-resolution objects and scenes to be composited together in natural illumination environments [1] and presented in our CAVE virtual reality environment. We also present a way to enhance the user interface for CAVE environments. The traditional methods of controlling the navigation through virtual environments include: glove, HUD's and 3D mouse devices. By integrating a wireless network that includes both WiFi (IEEE 802.11b/g) and Bluetooth (IEEE 802.15.1) protocols the non-graphical input control device can be eliminated. Therefore wireless devices can be added that would include: PDA's, Smart Phones, TabletPC's, Portable Gaming consoles, and PocketPC's.

  11. Fabrication of synthetic diffractive elements using advanced matrix laser lithography

    International Nuclear Information System (INIS)

    Škeren, M; Svoboda, J; Kveton, M; Fiala, P

    2013-01-01

    In this paper we present a matrix laser writing device based on a demagnified projection of a micro-structure from a computer driven spatial light modulator. The device is capable of writing completely aperiodic micro-structures with resolution higher than 200 000 DPI. An optical system is combined with ultra high precision piezoelectric stages with an elementary step ∼ 4 nm. The device operates in a normal environment, which significantly decreases the costs compared to competitive technologies. Simultaneously, large areas can be exposed up to 100 cm2. The capabilities of the constructed device will be demonstrated on particular elements fabricated for real applications. The optical document security is the first interesting field, where the synthetic image holograms are often combined with sophisticated aperiodic micro-structures. The proposed technology can easily write simple micro-gratings creating the color and kinetic visual effects, but also the diffractive cryptograms, waveguide couplers, and other structures recently used in the field of optical security. A general beam shaping elements and special photonic micro-structures are another important applications which will be discussed in this paper.

  12. Fabrication of synthetic diffractive elements using advanced matrix laser lithography

    Science.gov (United States)

    Škereň, M.; Svoboda, J.; Květoň, M.; Fiala, P.

    2013-02-01

    In this paper we present a matrix laser writing device based on a demagnified projection of a micro-structure from a computer driven spatial light modulator. The device is capable of writing completely aperiodic micro-structures with resolution higher than 200 000 DPI. An optical system is combined with ultra high precision piezoelectric stages with an elementary step ~ 4 nm. The device operates in a normal environment, which significantly decreases the costs compared to competitive technologies. Simultaneously, large areas can be exposed up to 100 cm2. The capabilities of the constructed device will be demonstrated on particular elements fabricated for real applications. The optical document security is the first interesting field, where the synthetic image holograms are often combined with sophisticated aperiodic micro-structures. The proposed technology can easily write simple micro-gratings creating the color and kinetic visual effects, but also the diffractive cryptograms, waveguide couplers, and other structures recently used in the field of optical security. A general beam shaping elements and special photonic micro-structures are another important applications which will be discussed in this paper.

  13. Hazardous materials in aquatic environments of the Mississippi River Basin Project management. Technical quarterly progress report, April 1, 1996--June 30, 1996

    Energy Technology Data Exchange (ETDEWEB)

    McLachlan, J.; Ide, C.F.; O`Connor, S.

    1996-08-01

    This quarterly report summarizes accomplishments for the Project examining hazardous materials in aquatic environments of the Mississippi River Basin. Among the many research areas summarized are the following: assessment of mechanisms of metal-induced reproductive toxicity in aquatic species as a biomarker of exposure; hazardous wastes in aquatic environment;ecological sentinels of aquatic contamination in the lower Mississippi River System; remediation of selected contaminants; rapid on-site immunassay for heavy metal contamination; molecular mechanisms of developmental toxicity induced by retinoids and retinoid-like molecules; resuseable synthetic membranes for the removal of aromatic and halogenated organic pollutants from waste water; Effects of steroid receptor activation in neurendocrine cell of the mammalian hypothalamus; modeling and assessment of environmental quality of louisiana bayous and swamps; enhancement of environmental education. The report also contains a summary of publications resulting from this project and an appendix with analytical core protocals and target compounds and metals.

  14. Fabrication of phosphor micro-grids using proton beam lithography

    International Nuclear Information System (INIS)

    Rossi, Paolo; Antolak, Arlyn J.; Provencio, Paula Polyak; Doyle, Barney Lee; Malmqvist, Klas; Hearne, Sean Joseph; Nilsson, Christer; Kristiansson, Per; Wegden, Marie; Elfman, Mikael; Pallon, Jan; Auzelyte, Vaida

    2005-01-01

    A new nuclear microscopy technique called ion photon emission microscopy or IPEM was recently invented. IPEM allows analysis involving single ions, such as ion beam induced charge (IBIC) or single event upset (SEU) imaging using a slightly modified optical microscope. The spatial resolution of IPEM is currently limited to more than 10 (micro)m by the scattering and reflection of ion-induced photons, i.e. light blooming or spreading, in the ionoluminescent phosphor layer. We are developing a 'Microscopic Gridded Phosphor' (also called Black Matrix) where the phosphor nanocrystals are confined within the gaps of a micrometer scale opaque grid, which limits the amount of detrimental light blooming. MeV-energy proton beam lithography is ideally suited to lithographically form masks for the grid because of high aspect ratio, pattern density and sub-micron resolution of this technique. In brief, the fabrication of the grids was made in the following manner: (1) a MeV proton beam focused to 1.5-2 (micro)m directly fabricated a matrix of pillars in a 15 (micro)m thick SU-8 lithographic resist; (2) 7:1 aspect ratio pillars were then formed by developing the proton exposed area; (3) Ni (Au) was electrochemically deposited onto Cu-coated Si from a sulfamate bath (or buffered CN bath); (4) the SU-8 pillars were removed by chemical etching; finally (5) the metal micro-grid was freed from its substrate by etching the underlying Cu layer. Our proposed metal micro-grids promise an order-of-magnitude improvement in the resolution of IPEM.

  15. Zero expansion glass ceramic ZERODUR® roadmap for advanced lithography

    Science.gov (United States)

    Westerhoff, Thomas; Jedamzik, Ralf; Hartmann, Peter

    2013-04-01

    The zero expansion glass ceramic ZERODUR® is a well-established material in microlithography in critical components as wafer- and reticle-stages, mirrors and frames in the stepper positioning and alignment system. The very low coefficient of thermal expansion (CTE) and its extremely high CTE homogeneity are key properties to achieve the tight overlay requirements of advanced lithography processes. SCHOTT is continuously improving critical material properties of ZERODUR® essential for microlithography applications according to a roadmap driven by the ever tighter material specifications broken down from the customer roadmaps. This paper will present the SCHOTT Roadmap for ZERODUR® material property development. In the recent years SCHOTT established a physical model based on structural relaxation to describe the coefficient of thermal expansion's temperature dependence. The model is successfully applied for the new expansion grade ZERODUR® TAILORED introduced to the market in 2012. ZERODUR® TAILORED delivers the lowest thermal expansion of ZERODUR® products at microlithography tool application temperature allowing for higher thermal stability for tighter overlay control in IC production. Data will be reported demonstrating the unique CTE homogeneity of ZERODUR® and its very high reproducibility, a necessary precondition for serial production for microlithography equipment components. New data on the bending strength of ZERODUR® proves its capability to withstand much higher mechanical loads than previously reported. Utilizing a three parameter Weibull distribution it is possible to derive minimum strength values for a given ZERODUR® surface treatment. Consequently the statistical uncertainties of the earlier approach based on a two parameter Weibull distribution have been eliminated. Mechanical fatigue due to stress corrosion was included in a straightforward way. The derived formulae allows calculating life time of ZERODUR® components for a given stress

  16. Stop Flow Lithography Synthesis and Characterization of Structured Microparticles

    Directory of Open Access Journals (Sweden)

    David Baah

    2014-01-01

    Full Text Available In this study, the synthesis of nonspherical composite particles of poly(ethylene glycol diacrylate (PEG-DA/SiO2 and PEG-DA/Al2O3 with single or multiple vias and the corresponding inorganic particles of SiO2 and Al2O3 synthesized using the Stop Flow Lithography (SFL method is reported. Precursor suspensions of PEG-DA, 2-hydroxy-2-methylpropiophenone, and SiO2 or Al2O3 nanoparticles were prepared. The precursor suspension flows through a microfluidic device mounted on an upright microscope and is polymerized in an automated process. A patterned photomask with transparent geometric features masks UV light to synthesize the particles. Composite particles with vias were synthesized and corresponding inorganic SiO2 and Al2O3 particles were obtained through polymer burn-off and sintering of the composites. The synthesis of porous inorganic particles of SiO2 and Al2O3 with vias and overall dimensions in the range of ~35–90 µm was achieved. BET specific surface area measurements for single via inorganic particles were 56–69 m2/g for SiO2 particles and 73–81 m2/g for Al2O3 particles. Surface areas as high as 114 m2/g were measured for multivia cubic SiO2 particles. The findings suggest that, with optimization, the particles should have applications in areas where high surface area is important such as catalysis and sieving.

  17. Putting E-government to work in healthcare environment: a multiregional project funded by the Italian Innovation & Technology Ministry.

    Science.gov (United States)

    Ballardini, Luigi; Germagnoli, Fabio; Pagani, Marco; Picchi, Marco; Stoppini, Andrea; Cristiani, Paolo

    2004-01-01

    In 2002, the Italian Ministry of Innovation promoted a national bid for e-government projects. Specifically it allocated a budget of 120 M euro. One of the four project approved in healthcare sector was the "Information, Care ("Assistenza" in Italian) and healthcare Education by the Web" (IAEW), with a global budget of 2580 k euro, partially financed by Ministry with a quota of 830 k euro. The project involves 12 medical structures (both national excellences centers and local regional hospitals) located in two different Region of North Italy, dealing with two different healthcare regional systems (Lombardia and Emilia-Romagna), with potentially 3 millions of users.

  18. [Artificial intelligence in medicine: project of a mobile platform in an intelligent environment for the care of disabled and elderly people].

    Science.gov (United States)

    Cortés, Ulises; Annicchiarico, Roberta; Campana, Fabio; Vázquez-Salceda, Javier; Urdiales, Cristina; Canãmero, Lola; López, Maite; Sánchez-Marrè, Miquel; Di Vincenzo, Sarah; Caltagirone, Carlo

    2004-04-01

    A project based on the integration of new technologies and artificial intelligence to develop a device--e-tool--for disabled patients and elderly people is presented. A mobile platform in intelligent environments (skilled-care facilities and home-care), controlled and managed by a multi-level architecture, is proposed to support patients and caregivers to increase self-dependency in activities of daily living.

  19. The joint European TEMPUS project 'Human Security (environment, quality of food, public health, and society) on territories contaminated by radioactive agents'

    International Nuclear Information System (INIS)

    Goncharova, N.; Butchenkow, I.; Maestri, E.

    2016-01-01

    Full text: The Joint European TEMPUS Project 'Human Security (environment, quality of food, public health, and society) on Territories Contaminated by Radioactive Agents', started in 2012. The EU project participants are the following: University of Cordoba (Spain) - Project Coordinator, University of Parma (Italy), University of Florence (Italy), Swedish University of Agricultural Sciences (Sweden) and Riga Technical University (Latvia). The project involves three partner countries - Belarus, Russia, Ukraine, represented by the following institutions: Belarusian State University, International Sakharov Environmental University, Grodno State Medical University, Grodno State Agrarian University, Voronezh State University, Tyumen State Medical Academy, Ural Federal University (Yekaterinburg), Chelyabinsk State University, Nuclear Cities Information-Education Centre, Vinnitsa National Medical University, Zhytomyr State Technological University, Kyiv International University, Sevastopol National University of Nuclear Energy and Industry, Polissya branch of G.M. Vysotsky Ukrainian Research Institute of Forestry and Forest Melioration. The main objectives of the project are: to develop interdisciplinary Master and Doctoral (PhD) programs in the field of Human Security of people living in areas affected by accidents at nuclear power plants / plant for processing nuclear fuel within the following specialties: Ecology and Environment Sciences - 'Human Security and Environment'; Food quality control - 'Human Security and Quality of Food'; Medicine - 'Human Security and Public Health'; Political and Social Sciences - 'Human Security and Society'. These programs will be implemented at 12 universities, 4 from each partner country. During the project implementation it is expected to achieve the following main results: modified interdisciplinary Master and Doctoral (PhD) programs taking into account the studied European experience and practice; joint system of upgrade of

  20. A preliminary study of synchrotron light sources for x-ray lithography

    International Nuclear Information System (INIS)

    Hoffmann, C.R.; Bigham, C.B.; Ebrahim, N.A.; Sawicki, J.A.; Taylor, T.

    1989-02-01

    A preliminary study of synchrotron light sources has been made, primarily oriented toward x-ray lithography. X-ray lithography is being pursued vigorously in several countries, with a goal of manufacturing high-density computer chips (0.25 μm feature sizes), and may attain commercial success in the next decade. Many other applications of soft x-rays appear worthy of investigation as well. The study group visited synchrotron radiation facilities and had discussions with members of the synchrotron radiation community, particularly Canadians. It concluded that accelerator technology for a conventional synchrotron light source appropriate for x-ray lithography is well established and is consistent with skills and experience at Chalk River Nuclear Laboratories. Compact superconducting systems are being developed also. Their technical requirements overlap with capabilities at Chalk River. (32 refs)