WorldWideScience

Sample records for electron-beam evaporative pvd

  1. Kinetics of Si and Ge nanowires growth through electron beam evaporation

    Directory of Open Access Journals (Sweden)

    Artoni Pietro

    2011-01-01

    Full Text Available Abstract Si and Ge have the same crystalline structure, and although Si-Au and Ge-Au binary alloys are thermodynamically similar (same phase diagram, with the eutectic temperature of about 360°C, in this study, it is proved that Si and Ge nanowires (NWs growth by electron beam evaporation occurs in very different temperature ranges and fluence regimes. In particular, it is demonstrated that Ge growth occurs just above the eutectic temperature, while Si NWs growth occurs at temperature higher than the eutectic temperature, at about 450°C. Moreover, Si NWs growth requires a higher evaporated fluence before the NWs become to be visible. These differences arise in the different kinetics behaviors of these systems. The authors investigate the microscopic growth mechanisms elucidating the contribution of the adatoms diffusion as a function of the evaporated atoms direct impingement, demonstrating that adatoms play a key role in physical vapor deposition (PVD NWs growth. The concept of incubation fluence, which is necessary for an interpretation of NWs growth in PVD growth conditions, is highlighted.

  2. Kinetics of Si and Ge nanowires growth through electron beam evaporation.

    Science.gov (United States)

    Artoni, Pietro; Pecora, Emanuele Francesco; Irrera, Alessia; Priolo, Francesco

    2011-02-21

    Si and Ge have the same crystalline structure, and although Si-Au and Ge-Au binary alloys are thermodynamically similar (same phase diagram, with the eutectic temperature of about 360°C), in this study, it is proved that Si and Ge nanowires (NWs) growth by electron beam evaporation occurs in very different temperature ranges and fluence regimes. In particular, it is demonstrated that Ge growth occurs just above the eutectic temperature, while Si NWs growth occurs at temperature higher than the eutectic temperature, at about 450°C. Moreover, Si NWs growth requires a higher evaporated fluence before the NWs become to be visible. These differences arise in the different kinetics behaviors of these systems. The authors investigate the microscopic growth mechanisms elucidating the contribution of the adatoms diffusion as a function of the evaporated atoms direct impingement, demonstrating that adatoms play a key role in physical vapor deposition (PVD) NWs growth. The concept of incubation fluence, which is necessary for an interpretation of NWs growth in PVD growth conditions, is highlighted.

  3. Electron beam assisted field evaporation of insulating nanowires/tubes

    Energy Technology Data Exchange (ETDEWEB)

    Blanchard, N. P., E-mail: nicholas.blanchard@univ-lyon1.fr; Niguès, A.; Choueib, M.; Perisanu, S.; Ayari, A.; Poncharal, P.; Purcell, S. T.; Siria, A.; Vincent, P. [Institut Lumière Matière, UMR5306 Université Lyon 1-CNRS, Université de Lyon, 69622 Villeurbanne Cedex (France)

    2015-05-11

    We demonstrate field evaporation of insulating materials, specifically BN nanotubes and undoped Si nanowires, assisted by a convergent electron beam. Electron irradiation leads to positive charging at the nano-object's apex and to an important increase of the local electric field thus inducing field evaporation. Experiments performed both in a transmission electron microscope and in a scanning electron microscope are presented. This technique permits the selective evaporation of individual nanowires in complex materials. Electron assisted field evaporation could be an interesting alternative or complementary to laser induced field desorption used in atom probe tomography of insulating materials.

  4. Observation of melt surface depressions during electron beam evaporation

    International Nuclear Information System (INIS)

    Ohba, Hironori; Shibata, Takemasa

    2000-08-01

    Depths of depressed surface of liquid gadolinium, cerium and copper during electron beam evaporation were measured by triangulation method using a CCD camera. The depression depths estimated from the balance of the vapor pressure and the hydrostatic pressure at the evaporation surface agreed with the measured values. The periodic fluctuation of atomic beam was observed when the depression of 3∼4 mm in depth was formed at the evaporation spot. (author)

  5. High-rate deposition of SI absorber layers by electron beam evaporation and first electron beam crystallization tests

    OpenAIRE

    Saager, Stefan; Ben Yaala, Marwa; Heinß, Jens-Peter; Temmler, Dietmar; Pfefferling, Bert; Metzner, Christoph

    2014-01-01

    In earlier electron beam physical vapor deposition tests (EB-PVD), using a conventional copper crucible (A), high Si deposition rates at relatively high EB power together with a contamination level of 1016 cm-3 are demonstrated. To improve the rate vs. EB power relation as well as the Si layer purity, two alternative high rate EBPVD methods are investigated and reported here - a contact-less crucible setup (B) and a crucible-free setup (C).In these experiments comparable deposition rates of ~...

  6. Power balance equation in electron beam evaporation process

    International Nuclear Information System (INIS)

    Blumenfeld, L.; Soubbaramayer.

    1994-01-01

    The aim of the paper is to solve the equation giving the total power of the gun, used in the electron beam evaporation process, in terms of the power used to generated the vapor stream and the three main power losses due to three parasite phenomena: turbulent thermal convection in the molten pool, electron back scattering and heat radiation from the vapor emitting surface. Scaling laws are first reviewed and results are given with the example of the evaporation of aluminium with a 5 kW axisymmetric gun working in steady state mode. The influence of an applied magnetic field on the evaporation rate is also examined. 5 refs., 3 figs., 1 tab

  7. Evaporation equipment with electron beam heating for the evaporation of metals and other conducting materials

    International Nuclear Information System (INIS)

    Mueller, P.

    1977-01-01

    Equipment for the evaporation of metals and other conducting materials by electron beam heating is to be improved by surrou nding the evaporation equipment with a grid, which has a negative voltage compared to the cathode. This achieves the state where the cathode is hit and damaged less by the ions formed, so that its life period is prolonged. (UWI) [de

  8. The effect of atoms excited by electron beam on metal evaporation

    CERN Document Server

    Xie Guo Feng; Ying Chun Tong

    2002-01-01

    In atomic vapor laser isotope separation (AVLIS), the metal is heated to melt by electron beams. The vapor atoms may be excited by electrons when flying through the electron beam. The excited atoms may be deexcited by inelastic collision during expansion. The electronic energy transfers translational energy. In order to analyse the effect of reaction between atoms and electron beams on vapor physical parameters, such as density, velocity and temperature, direct-simulation Monte Carlo method (DSMC) is used to simulate the 2-D gadolinium evaporation from long and narrow crucible. The simulation results show that the velocity and temperature of vapor increase, and the density decreases

  9. Studies for determining thermal ion extraction potential for aluminium plasma generated by electron beam evaporator

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, V Dileep; Barnwal, Tripti A; Mukherjee, Jaya; Gantayet, L M, E-mail: dileepv@barc.gov.i [Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai-400085 (India)

    2010-02-01

    For effective evaporation of refractory metal, electron beam is found to be most suitable vapour generator source. Using electron beam, high throughput laser based purification processes are carried out. But due to highly concentrated electron beam, the vapour gets ionised and these ions lead to dilution of the pure product of laser based separation process. To estimate the concentration of these ions and extraction potential requirement to remove these ions from vapour stream, experiments have been conducted using aluminium as evaporant. The aluminium ingots were placed in water cooled copper crucible. Inserts were used to hold the evaporant, in order to attain higher number density in the vapour processing zone and also for confining the liquid metal. Parametric studies with beam power, number density and extraction potential were conducted. In this paper we discuss the trend of the generation of thermal ions and electrostatic field requirement for extraction.

  10. Measurement of surface temperature profiles on liquid uranium metal during electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Ohba, Hironori; Shibata, Takemasa [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

    1998-11-01

    Surface temperature distributions of liquid uranium in a water-cooled copper crucible during electron beam evaporation were measured. Evaporation surface was imaged by a lens through a band-path filter (650{+-}5 nm) and a double mirror system on a charge coupled device (CCD) camera. The video signals of the recorded image were connected to an image processor and converted to two-dimensional spectral radiance profiles. The surface temperatures were obtained from the spectral radiation intensity ratio of the evaporation surface and a freezing point of uranium and/or a reference light source using Planck`s law of radiation. The maximum temperature exceeded 3000 K and had saturation tendency with increasing electron beam input. The measured surface temperatures agreed with those estimated from deposition rates and data of saturated vapor pressure of uranium. (author)

  11. Temperature profiles on the gadolinium surface during electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Ohba, Hironori; Shibata, Takemasa [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

    1995-03-01

    The distributions of surface temperature of gadolinium in a water-cooled copper crucible during electron beam evaporation were measured by optical pyrometry. The surface temperatures were obtained from the radiation intensity ratio of the evaporating surface and a reference light source using Planck`s law of radiation. The emitted radiation from the evaporating surface and a reference source was detected by a CCD sensor through a band pass filter of 650 nm. The measured surface temperature generally agreed with those estimated from the deposition rate and the data of the saturated vapor pressure. At high input powers, it was found that the measured value had small difference with the estimated one due to variation of the surface condition. (author).

  12. Temperature profiles on the gadolinium surface during electron beam evaporation

    International Nuclear Information System (INIS)

    Ohba, Hironori; Shibata, Takemasa

    1995-01-01

    The distributions of surface temperature of gadolinium in a water-cooled copper crucible during electron beam evaporation were measured by optical pyrometry. The surface temperatures were obtained from the radiation intensity ratio of the evaporating surface and a reference light source using Planck's law of radiation. The emitted radiation from the evaporating surface and a reference source was detected by a CCD sensor through a band pass filter of 650 nm. The measured surface temperature generally agreed with those estimated from the deposition rate and the data of the saturated vapor pressure. At high input powers, it was found that the measured value had small difference with the estimated one due to variation of the surface condition. (author)

  13. Miniature electron bombardment evaporation source: evaporation rate measurement

    International Nuclear Information System (INIS)

    Nehasil, V.; Masek, K.; Matolin, V.; Moreau, O.

    1997-01-01

    Miniature electron beam evaporation sources which operate on the principle of vaporization of source material, in the form of a tip, by electron bombardment are produced by several companies specialized in UHV equipment. These sources are used primarily for materials that are normally difficult to deposit due to their high evaporation temperature. They are appropriate for special applications such as heteroepitaxial thin film growth requiring a very low and well controlled deposition rate. A simple and easily applicable method of evaporation rate control is proposed. The method is based on the measurement of ion current produced by electron bombardment of evaporated atoms. The absolute evaporation flux values were measured by means of the Bayard-Alpert ion gauge, which enabled the ion current vs evaporation flux calibration curves to be plotted. (author). 1 tab., 4 figs., 6 refs

  14. CoPt nanoparticles deposited by electron beam evaporation

    International Nuclear Information System (INIS)

    Castaldi, L.; Giannakopoulos, K.; Travlos, A.; Niarchos, D.; Boukari, S.; Beaurepaire, E.

    2005-01-01

    Co 50 Pt 50 nanoparticles were co-deposited on thermally oxidized Si substrates by electron beam evaporation at 750 deg C. The mean particle sizes are between ∼5 and ∼20 nm and depend on the nominal thickness of the layer. Different processing conditions resulted in different structural and morphological properties of the samples which led to superparamagnetic and ferromagnetic behaviors. The post-annealing treatment of the CoPt nanograins resulted in the crystallization of the L1 0 ordered phase and in the magnetic hardening of nanoparticles with a maximum coercivity of ∼7.4 kOe

  15. Optical properties of YbF3-CaF2 composite thin films deposited by electron-beam evaporation

    Science.gov (United States)

    Wang, Songlin; Mi, Gaoyuan; Zhang, Jianfu; Yang, Chongmin

    2018-03-01

    We studied electron-beam evaporated YbF3-CaF2 composite films on ZnS substrate at different deposition parameters. The optical properties of films have been fitted, the surface roughness have been measured by AFM. The results of experiments indicated that increased the refractive indices, extinction coefficients, and surface roughness at higher deposition rate. The refractive index of composite film deposited by electron-beam evaporation with assisted-ion source was obviously higher than it without assisted-ion source.

  16. Characteristics of plasma in uranium atomic beam produced by electron-beam heating

    International Nuclear Information System (INIS)

    Ohba, Hironori; Shibata, Takemasa

    2000-08-01

    The electron temperature of plasma and the ion flux ratio in the uranium atomic beam produced by electron-beam heating were characterized with Langmuir probes. The electron temperature was 0.13 eV, which was lower than the evaporation surface temperature. The ion flux ratio to atomic beam flux was more than 3% at higher evaporation rates. The ion flux ratio has increased with decreasing acceleration energy of the electron-beam under constant electron-beam power. This is because of an increase of electron-beam current and a large ionization cross-section of uranium by electron-impact. It was confined that the plasma is produced by electron-impact ionization of the evaporated atoms at the evaporation source. (author)

  17. Industrial inline PVD metallization for silicon solar cells with laser fired contacts leading to 21.8% efficiency

    OpenAIRE

    Nekarda, J.; Reinwand, D.; Hartmann, P.; Preu, R.

    2010-01-01

    In this contribution we present the latest results of our experiments in regard to an industrially feasible inline physical vapor deposition (PVD) metallization method for the rear side of passivated solar cells. In an earlier publication, the quality of such processed layers and the feasibility of the tool was already shown and compared with a commonly used laboratory process based on electron beam evaporation. Since then a difference in the Voc potential in the range of ~ 4 mV between both ...

  18. Denton E-beam Evaporator #2

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: E-Beam Evap 2This is an electron gun evaporator for the deposition of metals and dielectrics thin films. Materials available are: Ag, Al, Au,...

  19. Nanograined Net-Shaped Fabrication of Rhenium Components by EB-PVD

    International Nuclear Information System (INIS)

    Singh, Jogender; Wolfe, Douglas E.

    2004-01-01

    Cost-effective net-shaped forming components have brought considerable interest into DoD, NASA and DoE. Electron beam physical vapor deposition (EB-PVD) offers flexibility in forming net-shaped components with tailored microstructure and chemistry. High purity rhenium (Re) components including rhenium-coated graphite balls, Re- plates and tubes have been successfully manufactured by EB-PVD. EB-PVD Re components exhibited sub-micron and nano-sized grains with high hardness and strength as compared to CVD. It is estimated that the cost of Re components manufactured by EB-PVD would be less than the current CVD and powder-HIP Technologies

  20. Electron Beam Evaporated TiO2 Layer for High Efficiency Planar Perovskite Solar Cells on Flexible Polyethylene Terephthalate Substrates

    KAUST Repository

    Qiu, Weiming; Paetzold, Ulrich W; Gehlhaar, Robert; Smirnov, Vladimir; Boyen, Hans-Gerd; Tait, Jeffrey Gerhart; Conings, Bert; Zhang, Weimin; Nielsen, Christian; McCulloch, Iain; Froyen, Ludo; Heremans, Paul; Cheyns, David

    2015-01-01

    The TiO2 layer made by electron beam (e-beam) induced evaporation is demonstrated as electron transport layer (ETL) in high efficiency planar junction perovskite solar cells. The temperature of the substrate and the thickness of the TiO2 layer can

  1. Optical band gap of ZnO thin films deposited by electron beam evaporation

    International Nuclear Information System (INIS)

    Nadeem, M. Y.; Ali, S. L.; Wasiq, M. F.; Rana, A. M.

    2006-01-01

    Optical band gap of ZnO thin films deposited by electron beam evaporation at evaporation rates ranging 5 As/sup -1/ to 15 As /sup -1/ and thickness ranging 1000A to 3000A is presented. Deposited films were annealed at 573K for one and half hour. The variations in the optical band gap were observed and showed decreasing behavior from 3.15 eV, 3.05 eV, from 3.18 eV to 3.10 eV and from 3.19 eV to 3.18 eV for films with respective thickness 1000A, 2000 A, 3000 A on increasing the evaporation rate from 5 As/sup-1/ to As/sup -1/ by keeping thickness constant. (author)

  2. Rate control for electron gun evaporation

    International Nuclear Information System (INIS)

    Schellingerhout, A.J.G.; Janocko, M.A.; Klapwijk, T.M.; Mooij, J.E.

    1989-01-01

    Principles for obtaining high-quality rate control for electron gun evaporation are discussed. The design criteria for rate controllers are derived from this analysis. Results are presented which have been obtained with e-guns whose evaporation rate is controlled by a Wehnelt electrode or by sweeping of the electron beam. Further improvements of rate stability can be obtained by improved design of e-guns and power supplies

  3. Uranium sandwich targets of 0.1 to 100 mg.cm-2 prepared by electron beam gun evaporation

    International Nuclear Information System (INIS)

    Folger, H.; Klemm, J.

    1978-01-01

    Metallic uranium layers of 0.1 to 100 mg.cm -2 between different backings and protecting layers were prepared for bombardments with heavy ions such as argon, krypton, xenon, lead, or uranium at energies of up to 8 MeV/u at the UNILAC of the GSI. An experimental set-up for the preparation of thick and oxygen-free sandwich targets using a 6 kVA electron beam gun was installed in a high vacuum apparatus. Then deposition and evaporation rates for uranium were investigated as a function of the electron beam gun power. It turned out that reproducible evaporation rates of up to 7 mg.s -1 were achieved when uranium pieces of 20 to 40 grams were used. Specific evaporation rates and vapor pressures for different temperatures were calculated. Some of these data are compared to measured values, especially evaporation rates at the evaporation point. The preparation, composition, and usage of uranium sandwich targets is described in detail. It concerns uranium layers of 0.1 to 100 mg.cm -2 deposited onto backings of carbon, titanium, nickel, gold, or glass. Evaporated films of carbon, titanium, nickel, or gold of 0.01 to 0.2 mg.cm -2 are used to protect the uranium layers from oxidation

  4. Electrical properties and surface morphology of electron beam evaporated p-type silicon thin films on polyethylene terephthalate for solar cells applications

    Energy Technology Data Exchange (ETDEWEB)

    Ang, P. C.; Ibrahim, K.; Pakhuruddin, M. Z. [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Minden 11800 Penang (Malaysia)

    2015-04-24

    One way to realize low-cost thin film silicon (Si) solar cells fabrication is by depositing the films with high-deposition rate and manufacturing-compatible electron beam (e-beam) evaporation onto inexpensive foreign substrates such as glass or plastic. Most of the ongoing research is reported on e-beam evaporation of Si films on glass substrates to make polycrystalline solar cells but works combining both e-beam evaporation and plastic substrates are still scarce in the literature. This paper studies electrical properties and surface morphology of 1 µm electron beam evaporated Al-doped p-type silicon thin films on textured polyethylene terephthalate (PET) substrate for application as an absorber layer in solar cells. In this work, Si thin films with different doping concentrations (including an undoped reference) are prepared by e-beam evaporation. Energy dispersion X-ray (EDX) showed that the Si films are uniformly doped by Al dopant atoms. With increased Al/Si ratio, doping concentration increased while both resistivity and carrier mobility of the films showed opposite relationships. Root mean square (RMS) surface roughness increased. Overall, the Al-doped Si film with Al/Si ratio of 2% (doping concentration = 1.57×10{sup 16} atoms/cm{sup 3}) has been found to provide the optimum properties of a p-type absorber layer for fabrication of thin film Si solar cells on PET substrate.

  5. Electrical properties and surface morphology of electron beam evaporated p-type silicon thin films on polyethylene terephthalate for solar cells applications

    Science.gov (United States)

    Ang, P. C.; Ibrahim, K.; Pakhuruddin, M. Z.

    2015-04-01

    One way to realize low-cost thin film silicon (Si) solar cells fabrication is by depositing the films with high-deposition rate and manufacturing-compatible electron beam (e-beam) evaporation onto inexpensive foreign substrates such as glass or plastic. Most of the ongoing research is reported on e-beam evaporation of Si films on glass substrates to make polycrystalline solar cells but works combining both e-beam evaporation and plastic substrates are still scarce in the literature. This paper studies electrical properties and surface morphology of 1 µm electron beam evaporated Al-doped p-type silicon thin films on textured polyethylene terephthalate (PET) substrate for application as an absorber layer in solar cells. In this work, Si thin films with different doping concentrations (including an undoped reference) are prepared by e-beam evaporation. Energy dispersion X-ray (EDX) showed that the Si films are uniformly doped by Al dopant atoms. With increased Al/Si ratio, doping concentration increased while both resistivity and carrier mobility of the films showed opposite relationships. Root mean square (RMS) surface roughness increased. Overall, the Al-doped Si film with Al/Si ratio of 2% (doping concentration = 1.57×1016 atoms/cm3) has been found to provide the optimum properties of a p-type absorber layer for fabrication of thin film Si solar cells on PET substrate.

  6. Evaporation model for beam based additive manufacturing using free surface lattice Boltzmann methods

    International Nuclear Information System (INIS)

    Klassen, Alexander; Scharowsky, Thorsten; Körner, Carolin

    2014-01-01

    Evaporation plays an important role in many technical applications including beam-based additive manufacturing processes, such as selective electron beam or selective laser melting (SEBM/SLM). In this paper, we describe an evaporation model which we employ within the framework of a two-dimensional free surface lattice Boltzmann method. With this method, we solve the hydrodynamics as well as thermodynamics of the molten material taking into account the mass and energy losses due to evaporation and the recoil pressure acting on the melt pool. Validation of the numerical model is performed by measuring maximum melt depths and evaporative losses in samples of pure titanium and Ti–6Al–4V molten by an electron beam. Finally, the model is applied to create processing maps for an SEBM process. The results predict that the penetration depth of the electron beam, which is a function of the acceleration voltage, has a significant influence on evaporation effects. (paper)

  7. Structure and corrosion properties of PVD Cr-N coatings

    CERN Document Server

    Liu, C; Ziegele, H; Leyland, A; Matthews, A

    2002-01-01

    PVD Cr-N coatings produced by physical vapor deposition (PVD) are increasingly used for mechanical and tribological applications in various industrial sectors. These coatings are particularly attractive for their excellent corrosion resistance, which further enhances the lifetime and service quality of coated components. PVD Cr-N coated steels in an aqueous solution are usually corroded by galvanic attack via through-coating 'permeable' defects (e.g., pores). Therefore, the corrosion performance of Cr-N coated steel is determined by a number of variables of the coating properties and corrosive environment. These variables include: (i) surface continuity and uniformity; (ii) through-coating porosity; (iii) film density and chemical stability; (iv) growth stresses; (v) interfacial and intermediate layers; (vi) coating thickness; (vii) coating composition; and (viii) substrate properties. In this article, PVD Cr-N coatings were prepared, by electron-beam PVD and sputter deposition, with different compositions, t...

  8. Composite Layers “MgAl Intermetalic Layer / PVD Coating” Obtained On The AZ91D Magnesium Alloy By Different Hybrid Surface Treatment Methods

    Directory of Open Access Journals (Sweden)

    Smolik J.

    2015-06-01

    Full Text Available Magnesium alloys have very interesting physical properties which make them ‘materials of the future’ for tools and machine components in many industry areas. However, very low corrosion and tribological resistance of magnesium alloys hampers the implementation of this material in the industry. One of the methods to improve the properties of magnesium alloys is the application of the solutions of surface engineering like hybrid technologies. In this paper, the authors compare the tribological and corrosion properties of two types of “MgAlitermetalic / PVD coating” composite layers obtained by two different hybrid surface treatment technologies. In the first configuration, the “MgAlitermetalic / PVD coating” composite layer was obtained by multisource hybrid surface treatment technology combining magnetron sputtering (MS, arc evaporation (AE and vacuum heating methods. The second type of a composite layer was prepared using a hybrid technology combined with a diffusion treatment process in Al-powder and the electron beam evaporation (EB method. The authors conclude, that even though the application of „MgAlitermetalic / PVD coating” composite layers can be an effective solution to increase the abrasive wear resistance of magnesium alloys, it is not a good solution to increase its corrosion resistance.

  9. Electron Beam Evaporated TiO2 Layer for High Efficiency Planar Perovskite Solar Cells on Flexible Polyethylene Terephthalate Substrates

    KAUST Repository

    Qiu, Weiming

    2015-09-30

    The TiO2 layer made by electron beam (e-beam) induced evaporation is demonstrated as electron transport layer (ETL) in high efficiency planar junction perovskite solar cells. The temperature of the substrate and the thickness of the TiO2 layer can be easily controlled with this e-beam induced evaporation method, which enables the usage of different types of substrates. Here, Perovskite solar cells based on CH3NH3PbI3-xClx achieve power conversion efficiencies of 14.6% on glass and 13.5% on flexible plastic substrates. The relationship between the TiO2 layer thickness and the perovskite morphology is studied with scanning electron microscope (SEM), atomic force microscope (AFM), and X-ray photoelectron spectroscopy (XPS). Our results indicate that pinholes in thin TiO2 layer lead to pinholes in the perovskite layer. By optimizing the TiO2 thickness, perovskite layers with substantially increased surface coverage and reduced pinhole areas are fabricated, increasing overall device performance.

  10. An investigation of process sensitivity for electron beam evaporation of beryllium

    International Nuclear Information System (INIS)

    Egert, C.M.; Schmoyer, D.D.; Nordin, C.W.; Berry, A.

    1991-01-01

    This paper reports on the process sensitivity of a beryllium coating process investigated using a statistical design of experiments approach. Process sensitivity is a measure of the variation in a given quality characteristic of the coating as a function of the evaporation process parameters. Manufacturing processes which maximize quality while simultaneously minimizing variability are most desirable. Three evaporation process parameters were included in this study: deposition rate, substrate temperature, and run time. A central composite experimental design employing a total of 18 coating runs was used to produce beryllium coatings on aluminum, silicon, fused silica, and beryllium substrates. The quality of the resulting coatings was characterized by scanning electron microscopy, IR spectrophotometry, stylus profilometry, and weight gain (thickness). Analysis of these results allowed the development of functional relationship between the quality characteristics (thickness, reflectance, etc.) and the evaporation process parameters. Process sensitivity for each response was then determined by calculating the gradient of each quality characteristic with respect to all three process parameters. Three dimensional plots were developed of the quality characteristic and its process sensitivity as a function of process parameters. Both quality characteristic and process sensitivity plots will be presented and discussed. For many of the quality characteristics, temperature during deposition was found to be the most sensitive process parameter for the beryllium c-beam evaporation process

  11. High quality flux control system for electron gun evaporation

    International Nuclear Information System (INIS)

    Appelbloom, A.M.; Hadley, P.; van der Marel, D.; Mooij, J.E.

    1991-01-01

    This paper reports on a high quality flux control system for electron gun evaporation developed and tested for the MBE growth of high temperature superconductors. The system can be applied to any electron gun without altering the electron gun itself. Essential elements of the system are a high bandwidth mass spectrometer, control electronics and a high voltage modulator to sweep the electron beam over the melt at high frequencies. the sweep amplitude of the electron beam is used to control the evaporation flux at high frequencies. The feedback loop of the system has a bandwidth of over 100 Hz, which makes it possible to grow superlattices and layered structures in a fast and precisely controlled manner

  12. Low-temperature epitaxy of silicon by electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Gorka, B. [Hahn-Meitner-Institut Berlin, Kekulestr. 5, 12489 Berlin (Germany); Dogan, P. [Hahn-Meitner-Institut Berlin, Kekulestr. 5, 12489 Berlin (Germany)], E-mail: pinar.dogan@hmi.de; Sieber, I.; Fenske, F.; Gall, S. [Hahn-Meitner-Institut Berlin, Kekulestr. 5, 12489 Berlin (Germany)

    2007-07-16

    In this paper we report on homoepitaxial growth of thin Si films at substrate temperatures T{sub s} = 500-650 deg. C under non-ultra-high vacuum conditions by using electron beam evaporation. Si films were grown at high deposition rates on monocrystalline Si wafers with (100), (110) and (111) orientations. The ultra-violet visible reflectance spectra of the films show a dependence on T{sub s} and on the substrate orientation. To determine the structural quality of the films in more detail Secco etch experiments were carried out. No etch pits were found on the films grown on (100) oriented wafers. However, on films grown on (110) and (111) oriented wafers different types of etch pits could be detected. Films were also grown on polycrystalline silicon (poly-Si) seed layers prepared by an Aluminum-Induced Crystallisation (AIC) process on glass substrates. Electron Backscattering Diffraction (EBSD) shows that the film growth proceeds epitaxially on the grains of the seed layer. But a considerably higher density of extended defects is revealed by Secco etch experiments.

  13. Use of thin films obtained by electron beam evaporation as optical wave guide

    International Nuclear Information System (INIS)

    Nobre, S.A.A.; Oliveira, C.A.S. de; Freire, G.F.de O.

    1986-01-01

    Thin films evaporated by electron beam for the fabrication of planar optical waveguides were used. The tested materials were aluminium oxide (Al 2 O 3 ) and tantalum pentoxide (Ta 2 O 5 ). The effect of annealing conditions on the film absorption was investigated for Ta 2 O 5 . The Al 2 O 3 films were characterized by the method of guided modes, in terms of refractive index measurements and film thickness. Atenuation measurements were also carried out. (M.C.K.) [pt

  14. A multi-component evaporation model for beam melting processes

    Science.gov (United States)

    Klassen, Alexander; Forster, Vera E.; Körner, Carolin

    2017-02-01

    In additive manufacturing using laser or electron beam melting technologies, evaporation losses and changes in chemical composition are known issues when processing alloys with volatile elements. In this paper, a recently described numerical model based on a two-dimensional free surface lattice Boltzmann method is further developed to incorporate the effects of multi-component evaporation. The model takes into account the local melt pool composition during heating and fusion of metal powder. For validation, the titanium alloy Ti-6Al-4V is melted by selective electron beam melting and analysed using mass loss measurements and high-resolution microprobe imaging. Numerically determined evaporation losses and spatial distributions of aluminium compare well with experimental data. Predictions of the melt pool formation in bulk samples provide insight into the competition between the loss of volatile alloying elements from the irradiated surface and their advective redistribution within the molten region.

  15. Properties of Silicon Dioxide Amorphous Nanopowder Produced by Pulsed Electron Beam Evaporation

    Directory of Open Access Journals (Sweden)

    Vladislav G. Il’ves

    2015-01-01

    Full Text Available SiO2 amorphous nanopowder (NP is produced with the specific surface area of 154 m2/g by means of evaporation by a pulsed electron beam aimed at Aerosil 90 pyrogenic amorphous NP (90 m2/g as a target. SiO2 NP nanoparticles showed improved magnetic, thermal, and optical properties in comparison to Aerosil 90 NP. Possible reasons of emergence of d0 ferromagnetism at the room temperature in SiO2 amorphous NP are discussed. Photoluminescent and cathode luminescent properties of the SiO2 NP were investigated.

  16. Evaporative cooling of highly charged ions in EBIT [Electron Beam Ion Trap]: An experimental realization

    International Nuclear Information System (INIS)

    Schneider, M.B.; Levine, M.A.; Bennett, C.L.; Henderson, J.R.; Knapp, D.A.; Marrs, R.E.

    1988-01-01

    Both the total number and trapping lifetime of near-neon-like gold ions held in an electron beam ion trap have been greatly increased by a process of 'evaporative cooling'. A continuous flow of low-charge-state ions into the trap cools the high-charge-state ions in the trap. Preliminary experimental results using titanium ions as a coolant are presented. 8 refs., 6 figs., 2 tabs

  17. Microstructural, mechanical and oxidation features of NiCoCrAlY coating produced by plasma activated EB-PVD

    International Nuclear Information System (INIS)

    He, Jian; Guo, Hongbo; Peng, Hui; Gong, Shengkai

    2013-01-01

    NiCoCrAlY coatings produced by electron beam-physical vapor deposition (EB-PVD) have been extensively used as the oxidation resistance coatings or suitable bond coats in thermal barrier coating (TBC) system. However, the inherent imperfections caused by EB-PVD process degrade the oxidation resistance of the coatings. In the present work, NiCoCrAlY coatings were creatively produced by plasma activated electron beam-physical vapor deposition (PA EB-PVD). The novel coatings showed a terraced substructure on the surface of each grain due to the increased energy of metal ions and enhanced mobility of adatoms. Also a strong (1 1 1) crystallographic texture of γ/γ′ grains was observed. The toughness of the coatings got remarkably improved compared with the coatings deposited by conventional EB-PVD and the oxidation behavior at 1373 K showed that the novel coatings had excellent oxidation resistance. The possible mechanism was finally discussed.

  18. Simulation of electron beam from two strip electron guns and control of power density by rotation of gun

    International Nuclear Information System (INIS)

    Sahu, G K; Baruah, S; Thakur, K B

    2012-01-01

    Electron beam is preferably used for large scale evaporation of refractory materials. Material evaporation from a long and narrow source providing a well collimated wedge shaped atomic beam has applications in isotopic purification of metals relevant to nuclear industry. The electron beam from an electron gun with strip type filament provides a linear heating source. However, the high power density of the electron beam can lead to turbulence of the melt pool and undesirable splashing of molten metal. For obtaining quiet surface evaporation, the linear electron beam is generally scanned along its length. To further reduce the power density to maintain quiet evaporation the width of the vapour source can be controlled by rotating the electron gun on its plane, thereby scanning an inclined beam over the molten pool. The rotation of gun has further advantages. When multiple strip type electron guns are used for scaling up evaporation length, a dark zone appears between two beams due to physical separation of adjacent guns. This dark zone can be reduced by rotating the gun and thereby bringing two adjacent beams closer. The paper presented here provides the simulation results of the electron beam trajectory and incident power density originating from two strip electron guns by using in-house developed code. The effect of electron gun rotation on the electron beam trajectory and power density is studied. The simulation result is experimentally verified with the image of molten pool and heat affected zone taken after experiment. This technique can be gainfully utilized in controlling the time averaged power density of the electron beam and obtaining quiet evaporation from the metal molten pool.

  19. Frozen-in vacancies in PVD-Cu films with improved high-pressure reflowability studied using a slow positron beam

    Energy Technology Data Exchange (ETDEWEB)

    Yabuuchi, A; Kubo, D; Mizuno, M; Araki, H [Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan); Onishi, T [Materials Research Laboratory, Kobe Steel Ltd., 5-5 Takatsukadai 1-chome, Nishi-ku, Kobe, Hyogo 651-2271 (Japan); Shirai, Y [Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501 (Japan)], E-mail: atsushi.yabuuchi@mat.eng.osaka-u.ac.jp

    2009-05-01

    Recently, a new process has been proposed for fabricating a LSI interconnection; filling trenches and via holes with Cu using high-pressure annealing treatment. It is already known that a Cu film produced by physical vapor deposition (PVD) has a lower reflowability compared to a Cu film produced by electrochemical deposition (ECD). Additionally, it has also been recognized that the addition of Sb to the PVD-Cu film improves the reflowability. However, the factors responsible for the reflowability of Cu films have not yet been studied. In this work, we evaluated a PVD pure-Cu film and a PVD Cu-0.5at%Sb film by using a slow positron beam. Addition of Sb led to the introduction of lattice defects in the as-deposited film. These defects that were observed in the PVD-CuSb dilute alloy film were identified as frozen-in vacancies that were produced during deposition.

  20. Frozen-in vacancies in PVD-Cu films with improved high-pressure reflowability studied using a slow positron beam

    International Nuclear Information System (INIS)

    Yabuuchi, A; Kubo, D; Mizuno, M; Araki, H; Onishi, T; Shirai, Y

    2009-01-01

    Recently, a new process has been proposed for fabricating a LSI interconnection; filling trenches and via holes with Cu using high-pressure annealing treatment. It is already known that a Cu film produced by physical vapor deposition (PVD) has a lower reflowability compared to a Cu film produced by electrochemical deposition (ECD). Additionally, it has also been recognized that the addition of Sb to the PVD-Cu film improves the reflowability. However, the factors responsible for the reflowability of Cu films have not yet been studied. In this work, we evaluated a PVD pure-Cu film and a PVD Cu-0.5at%Sb film by using a slow positron beam. Addition of Sb led to the introduction of lattice defects in the as-deposited film. These defects that were observed in the PVD-CuSb dilute alloy film were identified as frozen-in vacancies that were produced during deposition.

  1. Structural and magnetic properties of SmCo-based magnetic films grown by electron-beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Saravanan, P., E-mail: psdrdo@gmail.com [Defence Metallurgical Research Laboratory, Hyderabad 500058 (India); Vinod, V.T.P.; Černík, Miroslav [Institute for Nanomaterials, Advanced Technologies and Innovation, Department of Natural Sciences, Technical University of Liberec, Studentská 1402/2, Liberec 1, 461 17 (Czech Republic); Vishnuraj, R.; Arout Chelvane, J.; Kamat, S.V. [Defence Metallurgical Research Laboratory, Hyderabad 500058 (India); Hsu, Jen-Hwa, E-mail: jhhsu@phys.ntu.edu.tw [Department of Physics, National Taiwan University, Taipei 106, Taiwan (China)

    2015-07-01

    Sub-micron thick Sm–Co films (200 and 300 nm) with selective phase composition are grown on Si (100) substrates by electron-beam evaporation using Sm-lean alloy targets such as Sm{sub 4}Co{sub 96} and Sm{sub 8}Co{sub 92}. The structural and magnetic properties of Sm–Co films are characterized by x-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM) and super-conducting quantum interference device (SQUID) magnetometer. The Sm–Co films obtained with the Sm{sub 4}Co{sub 96} target exhibit Sm{sub 2}Co{sub 17} as a prominent phase; while the films produced with the Sm{sub 8}Co{sub 92} target show Sm{sub 2}Co{sub 7} as a major phase. Both the Sm–Co films reveal granular morphology; however, the estimated grain size values are slightly lower in the case of Sm{sub 2}Co{sub 7} films, irrespective of their thicknesses. Coercivity (H{sub c}) values of 1.48 and 0.9 kOe are achieved for the as-grown 200-nm thick Sm{sub 2}Co{sub 17} and Sm{sub 2}Co{sub 7}-films. Temperature-dependent magnetization studies confirm that the demagnetization behaviors of these films are consistent with respect to the identified phase composition. Upon rapid thermal annealing, maximum H{sub c} value of 8.4 kOe is achieved for the 200 nm thick Sm{sub 2}Co{sub 17}-films. As far as e-beam evaporated Sm–Co films are concerned, this H{sub c} value is one of the best values reported so far. - Highlights: • Electron-beam evaporation was exploited to grow sub-μm thick Sm–Co films. • Sm{sub 2}Co{sub 7} and Sm{sub 2}Co{sub 17} magnetic phases were crystallized using Sm-lean alloy targets. • Both 200 and 300-nm thick Sm–Co films revealed distinct granular morphology. • Sm–Co films of lower thickness exhibited high H{sub c} and low M{sub s} and vice-versa. • Coercivity value of 8.4 kOe achieved for the 200-nm thick Sm{sub 2}Co{sub 17}-films after RTA.

  2. Thermocyclic behaviour of microstructurally modified EB-PVD thermal barrier coatings

    International Nuclear Information System (INIS)

    Schulz, U.; Fritscher, K.; Raetzer-Scheibe, H.-J.; Kaysser, W.A.; Peters, M.

    1997-01-01

    This paper focuses on the combined effects of substrate temperature and rotation during electron-beam physical vapor deposition (EB-PVD) on the columnar microstructure of yttria partially stabilized zirconia (YPSZ) thermal barrier coatings. Diameter and degree of ordering of the columns and the density of the coatings are sensitive to the processing parameters. Results are discussed in the frame of common structural zone models for PVD processes. The models are extended to consider the rotational effect. EB-PVD YPSZ TBCs of different column diameters were deposited on top of an EB-PVD NiCoCrAlY bondcoat on IN 100 superalloy test bars. The performance of the TBCs was investigated in a cyclic oxidation furnace test rig between 1100 C and 130 C and in a burner rig under hot gas corrosion conditions at a maximum temperature of 900 C. Results showed a correlation between cyclic lifetime and the various microstructures of the TBCs. Samples having a non-regular arrangement of columns performed best in both tests. (orig.)

  3. Photoluminescence of electron beam evaporated CaS:Bi thin films

    CERN Document Server

    Smet, P F; Poelman, D R; Meirhaeghe, R L V

    2003-01-01

    For the first time, the photoluminescence (PL) of electron beam evaporated CaS:Bi thin films is reported. Luminescent CaS:Bi powder prepared out of aqueous solutions was used as source material. The influence of substrate temperature on the PL and the morphology of thin films is discussed, and an optimum is determined. Substrate temperatures between 200 deg. C and 300 deg. C lead to good quality thin films with sufficient PL intensity. As-deposited thin films show two emission bands, peaking at 450 and 530 nm. Upon annealing the emission intensity increases, and annealing at 800 deg. C is sufficient to obtain a homogeneously blue emitting thin film (CIE colour coordinates (0.17; 0.12)), thanks to a single remaining emission band at 450 nm. The influence of ambient temperature on the PL of CaS:Bi powder and thin films was also investigated and it was found that CaS:Bi thin films show a favourable thermal quenching behaviour near room temperature.

  4. Metallic Conductive Nanowires Elaborated by PVD Metal Deposition on Suspended DNA Bundles.

    Science.gov (United States)

    Brun, Christophe; Elchinger, Pierre-Henri; Nonglaton, Guillaume; Tidiane-Diagne, Cheikh; Tiron, Raluca; Thuaire, Aurélie; Gasparutto, Didier; Baillin, Xavier

    2017-09-01

    Metallic conductive nanowires (NWs) with DNA bundle core are achieved, thanks to an original process relying on double-stranded DNA alignment and physical vapor deposition (PVD) metallization steps involving a silicon substrate. First, bundles of DNA are suspended with a repeatable process between 2 µm high parallel electrodes with separating gaps ranging from 800 nm to 2 µm. The process consists in the drop deposition of a DNA lambda-phage solution on the electrodes followed by a naturally evaporation step. The deposition process is controlled by the DNA concentration within the buffer solution, the drop volume, and the electrode hydrophobicity. The suspended bundles are finally metallized with various thicknesses of titanium and gold by a PVD e-beam evaporation process. The achieved NWs have a width ranging from a few nanometers up to 100 nm. The electrical behavior of the achieved 60 and 80 nm width metallic NWs is shown to be Ohmic and their intrinsic resistance is estimated according to different geometrical models of the NW section area. For the 80 nm width NWs, a resistance of about few ohms is established, opening exploration fields for applications in microelectronics. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Effect of Growth Parameters on SnO2 Nanowires Growth by Electron Beam Evaporation Method

    Science.gov (United States)

    Rakesh Kumar, R.; Manjula, Y.; Narasimha Rao, K.

    2018-02-01

    Tin oxide (SnO2) nanowires were synthesized via catalyst assisted VLS growth mechanism by the electron beam evaporation method at a growth temperature of 450 °C. The effects of growth parameters such as evaporation rate of Tin, catalyst film thickness, and different types of substrates on the growth of SnO2 nanowires were studied. Nanowires (NWs) growth was completely seized at higher tin evaporation rates due to the inability of the catalyst particle to initiate the NWs growth. Nanowires diameters were able to tune with catalyst film thickness. Nanowires growth was completely absent at higher catalyst film thickness due to agglomeration of the catalyst film. Optimum growth parameters for SnO2 NWs were presented. Nanocomposites such as Zinc oxide - SnO2, Graphene oxide sheets- SnO2 and Graphene nanosheets-SnO2 were able to synthesize at a lower substrate temperature of 450 °C. These nanocompsoites will be useful in enhancing the capacity of Li-ion batteries, the gas sensing response and also useful in increasing the photo catalytic activity.

  6. Mixed phase evaporation source

    International Nuclear Information System (INIS)

    1975-01-01

    Apparatus for reducing convection current heat loss in electron beam evaporator is described. A material to be evaporated (evaporant) is placed in the crucible of an electron beam evaporation source along with a porous mass formed of a powdered or finely divided solid to act as an impedance to convection currents. A feed system is employed to replenish the supply of evaporant as it is vaporized

  7. A comparative study of the electrical properties of Pd/ZnO Schottky contacts fabricated using electron beam deposition and resistive/thermal evaporation techniques

    International Nuclear Information System (INIS)

    Mtangi, W.; Auret, F. D.; Janse van Rensburg, P. J.; Coelho, S. M. M.; Legodi, M. J.; Nel, J. M.; Meyer, W. E.; Chawanda, A.

    2011-01-01

    A systematic investigation to check the quality of Pd Schottky contacts deposited on ZnO has been performed on electron beam (e-beam) deposited and resistively/thermally evaporated samples using current-voltage, IV, and conventional deep level transient spectroscopy (DLTS) measurements. Room temperature IV measurements reveal the dominance of pure thermionic emission on the resistively evaporated contacts, while the e-beam deposited contacts show the dominance of generation recombination at low voltages, -10 A at a reverse voltage of 1.0 V whereas the e-beam deposited contacts have reverse currents of the order of 10 -6 A at 1.0 V. Average ideality factors have been determined as (1.43 ± 0.01) and (1.66 ± 0.02) for the resistively evaporated contacts and e-beam deposited contacts, respectively. The IV barrier heights have been calculated as (0.721 ± 0.002) eV and (0.624 ± 0.005) eV for the resistively evaporated and e-beam deposited contacts, respectively. Conventional DLTS measurements reveal the presence of three prominent defects in both the resistive and e-beam contacts. Two extra peaks with energy levels of 0.60 and 0.81 eV below the conduction band minimum have been observed in the e-beam deposited contacts. These have been explained as contributing to the generation recombination current that dominates at low voltages and high leakage currents. Based on the reverse current at 1.0 V, the degree of rectification, the dominant current transport mechanism and the observed defects, we conclude that the resistive evaporation technique yields better quality Schottky contacts for use in solar cells and ultraviolet detectors compared to the e-beam deposition technique. The 0.60 eV has been identified as possibly related to the unoccupied level for the doubly charged oxygen vacancy, V o 2+ .

  8. Denton E-beam Evaporator #1

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: E-Beam Evap 1This is a dual e-beam/thermal evaporator for the deposition of metal and dielectric thin films. Materials available are: Ag, Al,...

  9. Flexible free-standing TiO2/graphene/PVdF films as anode materials for lithium-ion batteries

    International Nuclear Information System (INIS)

    Ren, H.M.; Ding, Y.H.; Chang, F.H.; He, X.; Feng, J.Q.; Wang, C.F.; Jiang, Y.; Zhang, P.

    2012-01-01

    Highlights: ► Flexible TiO 2 /graphene electrode was prepared by a solvent evaporation technique. ► PVdF was used as substance to support the TiO 2 /graphene active materials. ► The flexible films can be employed as anode materials for Li-ion battery. - Abstract: Graphene composites were prepared by hydrothermal method using titanium dioxide (TiO 2 ) adsorbed graphene oxide (GO) sheets as precursors. Free-standing hybrid films for lithium-ion batteries were prepared by adding TiO 2 /graphene composites to the polyvinylidene fluoride (PVdF)/N-methyl-2-pyrrolidone (NMP) solution, followed by a solvent evaporation technique. These films were characterized by atomic force microscopy (AFM), X-ray diffraction (XRD), scanning electron microscopy (SEM) and various electrochemical techniques. Flexible films show an excellent cycling performance, which was attributed to the interconnected graphene conducting network, which depressed the increasing of electric resistance during the cycling.

  10. Comparative analysis of electrophysical properties of ceramic tantalum pentoxide coatings, deposited by electron beam evaporation and magnetron sputtering methods

    Science.gov (United States)

    Donkov, N.; Mateev, E.; Safonov, V.; Zykova, A.; Yakovin, S.; Kolesnikov, D.; Sudzhanskaya, I.; Goncharov, I.; Georgieva, V.

    2014-12-01

    Ta2O5 ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5 coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5 coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5 ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes

  11. Effect of annealing and In content on the properties of electron beam evaporated ZnO films

    Science.gov (United States)

    Mohamed, S. H.; Ali, H. M.; Mohamed, H. A.; Salem, A. M.

    2005-08-01

    The effect of both annealing and In content on the properties of ZnO films prepared by electron beam evaporation were investigated. The evaporation was carried out at room temperature from bulk samples prepared by sintering technique. X-ray diffraction showed that the structure of ZnO-In{2}O{3} films depends on both the In content and annealing temperature. Amorphous, highly transparent and relatively low resistive films which can be suitable for the usage as transparent electrode of organic light-emitting diode were obtained upon annealing at 300 circC. Partially crystalline, highly transparent and highly resistive films which can be used in piezoelectric applications were obtained upon annealing at 500 circC. For each composition the refractive index has no monotonic variation upon increasing annealing temperature.

  12. Structure and corrosion properties of PVD Cr-N coatings

    International Nuclear Information System (INIS)

    Liu, C.; Bi, Q.; Ziegele, H.; Leyland, A.; Matthews, A.

    2002-01-01

    PVD Cr-N coatings produced by physical vapor deposition (PVD) are increasingly used for mechanical and tribological applications in various industrial sectors. These coatings are particularly attractive for their excellent corrosion resistance, which further enhances the lifetime and service quality of coated components. PVD Cr-N coated steels in an aqueous solution are usually corroded by galvanic attack via through-coating 'permeable' defects (e.g., pores). Therefore, the corrosion performance of Cr-N coated steel is determined by a number of variables of the coating properties and corrosive environment. These variables include: (i) surface continuity and uniformity; (ii) through-coating porosity; (iii) film density and chemical stability; (iv) growth stresses; (v) interfacial and intermediate layers; (vi) coating thickness; (vii) coating composition; and (viii) substrate properties. In this article, PVD Cr-N coatings were prepared, by electron-beam PVD and sputter deposition, with different compositions, thicknesses, and surface roughnesses, by changing the N 2 flow rate, applying multilayering techniques and changing the substrate finish prior to coating. The microstructure of such coatings is investigated by various analytical techniques such as glancing angle x-ray diffraction and scanning electron microscopy, which are also correlated with the corrosion performance of the coated steel. Both dc polarization and ac impedance spectroscopy were employed to investigate the corrosion resistance of Cr-N coated steel in a 0.5N NaCl solution. It has been found that the N 2 flow rate during reactive deposition strongly determines the microstructure of Cr-N coatings (due to the changing nitrogen content in the film) and can thus affect the corrosion resistance of coated systems. The surface finish of the steel substrate also affects the uniformity and coverage of PVD coatings; grooves and inclusions on the original substrate can raise the susceptibility of coated

  13. Annealing effects on electron-beam evaporated Al2O3 films

    International Nuclear Information System (INIS)

    Shang Shuzhen; Chen Lei; Hou Haihong; Yi Kui; Fan Zhengxiu; Shao Jianda

    2005-01-01

    The effects of post-deposited annealing on structure and optical properties of electron-beam evaporated Al 2 O 3 single layers were investigated. The films were annealed in air for 1.5 h at different temperatures from 250 to 400 deg. C. The optical constants and cut-off wavelength were deduced. Microstructure of the samples was characterized by X-ray diffraction (XRD). Profile and surface roughness measurement instrument was used to determine the rms surface roughness. It was found that the cut-off wavelength shifted to short wavelength as the annealing temperature increased and the total optical loss decreased. The film structure remained amorphous even after annealing at 400 deg. C temperature and the samples annealed at higher temperature had the higher rms surface roughness. The decreasing total optical loss with annealing temperature was attributed to the reduction of absorption owing to oxidation of the film by annealing. Guidance to reduce the optical loss of excimer laser mirrors was given

  14. Annealing effects on electron-beam evaporated Al 2O 3 films

    Science.gov (United States)

    Shuzhen, Shang; Lei, Chen; Haihong, Hou; Kui, Yi; Zhengxiu, Fan; Jianda, Shao

    2005-04-01

    The effects of post-deposited annealing on structure and optical properties of electron-beam evaporated Al 2O 3 single layers were investigated. The films were annealed in air for 1.5 h at different temperatures from 250 to 400 °C. The optical constants and cut-off wavelength were deduced. Microstructure of the samples was characterized by X-ray diffraction (XRD). Profile and surface roughness measurement instrument was used to determine the rms surface roughness. It was found that the cut-off wavelength shifted to short wavelength as the annealing temperature increased and the total optical loss decreased. The film structure remained amorphous even after annealing at 400 °C temperature and the samples annealed at higher temperature had the higher rms surface roughness. The decreasing total optical loss with annealing temperature was attributed to the reduction of absorption owing to oxidation of the film by annealing. Guidance to reduce the optical loss of excimer laser mirrors was given.

  15. High temperature oxidation behavior of hafnium modified NiAl bond coat in EB-PVD thermal barrier coating system

    Energy Technology Data Exchange (ETDEWEB)

    Guo Hongbo; Sun Lidong; Li Hefei [Department of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, No.37 Xueyuan Road, Beijing 100083 (China); Gong Shengkai [Department of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, No.37 Xueyuan Road, Beijing 100083 (China)], E-mail: gongsk@buaa.edu.cn

    2008-06-30

    NiAl coatings doped with 0.5 at.% and 1.5 at.% Hf were produced by co-evaporation of NiAl and Hf ingots by electron beam physical vapor deposition (EB-PVD), respectively. The addition of 0.5 at.% Hf significantly improved the cyclic oxidation resistance of the NiAl coating. The TGO layer in the 1.5 at.% Hf doped NiAl coating is straight; while that in the 0.5 at.% Hf doped coating became undulated after thermal cycling. The doped NiAl thermal barrier coatings (TBCs) revealed improved thermal cycling lifetimes at 1423 K, compared to the undoped TBC. Failure of the 0.5 at.% Hf doped TBC occurred by cracking at the interface between YSZ topcoat and bond coat, while the 1.5 at.% Hf doped TBC cracked at the interface between bond coat and substrate.

  16. Integrated control system for electron beam processes

    Science.gov (United States)

    Koleva, L.; Koleva, E.; Batchkova, I.; Mladenov, G.

    2018-03-01

    The ISO/IEC 62264 standard is widely used for integration of the business systems of a manufacturer with the corresponding manufacturing control systems based on hierarchical equipment models, functional data and manufacturing operations activity models. In order to achieve the integration of control systems, formal object communication models must be developed, together with manufacturing operations activity models, which coordinate the integration between different levels of control. In this article, the development of integrated control system for electron beam welding process is presented as part of a fully integrated control system of an electron beam plant, including also other additional processes: surface modification, electron beam evaporation, selective melting and electron beam diagnostics.

  17. Double Pulse LIBS of Titanium-Based PVD-Coatings with Submicron Resolution

    Directory of Open Access Journals (Sweden)

    K. Ermalitskaia

    2016-01-01

    Full Text Available The possibility for double pulse LIBS in the process of a direct layer-by-layer analysis of the titanium-based PVD-coatings on polished flat blank samples of steel and silicon and also of the TiAlN/TiN-coating on a milling cutter is considered. A method is proposed to control thickness of the radiation evaporated layer by defocusing the laser beam with respect to the surface, making it possible to attain the depth resolution of 0.1 μm. The Ti and Ti-Zr-coatings produced using the ion-assisted condensation method and subjected to streams of the nitrogen plasma in a magnetic-plasma compressor are studied.

  18. Melt and vapor characteristics in an electron beam evaporator

    Energy Technology Data Exchange (ETDEWEB)

    Blumenfeld, L.; Fleche, J.L.; Gonella, C.; Soubbaramayer

    1994-12-31

    Two different approaches have been compared for the calculation of the free surface temperature Ts in cerium or copper evaporation experiments: the first method considers properties of the melt: an empirical law is used to take into account turbulent thermal convection, instabilities and characterization of the free surface. The second method considers the vapor flow expansion and connects Ts to the measured terminal temperature and terminal mean parallel velocity of the vapor jet, by direct simulation Monte Carlo calculations including an atom-atom inelastic collision algorithm. The agreement between the two approaches is better for cerium than for copper in the high characterization case. The analysis, from the point of view of the properties of the melt, of the terminal parameters of the vapor jet for the high beam powers shows that Ts and the Knudsen number at the vapour source reach a threshold when the beam power increases. (author). 12 figs., 1 tab., 21 refs.

  19. Thermal Conductivity of EB-PVD Thermal Barrier Coatings Evaluated by a Steady-State Laser Heat Flux Technique

    Science.gov (United States)

    Zhu, Dongming; Miller, Robert A.; Nagaraj, Ben A.; Bruce, Robert W.

    2000-01-01

    The thermal conductivity of electron beam-physical vapor deposited (EB-PVD) Zr02-8wt%Y2O3 thermal barrier coatings was determined by a steady-state heat flux laser technique. Thermal conductivity change kinetics of the EB-PVD ceramic coatings were also obtained in real time, at high temperatures, under the laser high heat flux, long term test conditions. The thermal conductivity increase due to micro-pore sintering and the decrease due to coating micro-delaminations in the EB-PVD coatings were evaluated for grooved and non-grooved EB-PVD coating systems under isothermal and thermal cycling conditions. The coating failure modes under the high heat flux test conditions were also investigated. The test technique provides a viable means for obtaining coating thermal conductivity data for use in design, development, and life prediction for engine applications.

  20. A directly heated electron beam line source

    International Nuclear Information System (INIS)

    Iqbal, M.; Masood, K.; Rafiq, M.; Chaudhry, M.A.

    2002-05-01

    A 140-mm cathode length, Electron Beam Line Source with a high degree of focusing of the beam is constructed. The design principles and basic characteristic considerations for electron beam line source consists of parallel plate electrode geometric array as well as a beam power of 35kW are worked out. The dimensions of the beam at the work site are 1.25xl00mm. The gun is designed basically for the study of evaporation and deposition characteristic of refractory metals for laboratory use. However, it may be equally used for melting and casting of these metals. (author)

  1. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).

    Science.gov (United States)

    Böke, Frederik; Giner, Ignacio; Keller, Adrian; Grundmeier, Guido; Fischer, Horst

    2016-07-20

    Densely sintered aluminum oxide (α-Al2O3) is chemically and biologically inert. To improve the interaction with biomolecules and cells, its surface has to be modified prior to use in biomedical applications. In this study, we compared two deposition techniques for adhesion promoting SiOx films to facilitate the coupling of stable organosilane monolayers on monolithic α-alumina; physical vapor deposition (PVD) by thermal evaporation and plasma enhanced chemical vapor deposition (PE-CVD). We also investigated the influence of etching on the formation of silanol surface groups using hydrogen peroxide and sulfuric acid solutions. The film characteristics, that is, surface morphology and surface chemistry, as well as the film stability and its adhesion properties under accelerated aging conditions were characterized by means of X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), inductively coupled plasma-optical emission spectroscopy (ICP-OES), and tensile strength tests. Differences in surface functionalization were investigated via two model organosilanes as well as the cell-cytotoxicity and viability on murine fibroblasts and human mesenchymal stromal cells (hMSC). We found that both SiOx interfaces did not affect the cell viability of both cell types. No significant differences between both films with regard to their interfacial tensile strength were detected, although failure mode analyses revealed a higher interfacial stability of the PE-CVD films compared to the PVD films. Twenty-eight day exposure to simulated body fluid (SBF) at 37 °C revealed a partial delamination of the thermally deposited PVD films whereas the PE-CVD films stayed largely intact. SiOx layers deposited by both PVD and PE-CVD may thus serve as viable adhesion-promoters for subsequent organosilane coupling agent binding to α-alumina. However, PE-CVD appears to be favorable for long-term direct film exposure to aqueous

  2. Pumping experiment of water on B and LaB6 films with electron beam evaporator

    International Nuclear Information System (INIS)

    Mori, Takahiro; Hanaoka, Yutaka; Akaishi, Kenya; Kubota, Yusuke; Motojima, Osamu; Mushiaki, Motoi; Funato, Yasuyuki.

    1992-10-01

    Pumping characteristics of water vapor on boron and lanthanum hexaboride films formed with an electron beam evaporator have been investigated in high vacuum of a pressure region between 10 -4 and 10 -3 Pa. Measured initial maximum pumping speeds of water for fresh B and LaB 6 films on substrates with a deposition amount from 2.3 x 10 21 to 6.7 x 10 21 molecules·m -2 are 3.2 ∼ 4.9 m 3 ·s -1 ·m -2 , and maximum saturation amounts of adsorbed water on these films are 2.9 x 10 20 ∼ 1.3 x 10 21 H 2 O molecules·m -2 . (author)

  3. Metallographic techniques for evaluation of Thermal Barrier Coatings produced by Electron Beam Physical Vapor Deposition

    International Nuclear Information System (INIS)

    Kelly, Matthew; Singh, Jogender; Todd, Judith; Copley, Steven; Wolfe, Douglas

    2008-01-01

    Thermal Barrier Coatings (TBC) produced by Electron Beam Physical Vapor Deposition (EB-PVD) are primarily applied to critical hot section turbine components. EB-PVD TBC for turbine applications exhibit a complicated structure of porous ceramic columns separated by voids that offers mechanical compliance. Currently there are no standard evaluation methods for evaluating EB-PVD TBC structure quantitatively. This paper proposes a metallographic method for preparing samples and evaluating techniques to quantitatively measure structure. TBC samples were produced and evaluated with the proposed metallographic technique and digital image analysis for columnar grain size and relative intercolumnar porosity. Incorporation of the proposed evaluation technique will increase knowledge of the relation between processing parameters and material properties by incorporating a structural link. Application of this evaluation method will directly benefit areas of quality control, microstructural model development, and reduced development time for process scaling

  4. 7YSZ coating prepared by PS-PVD based on heterogeneous nucleation

    Directory of Open Access Journals (Sweden)

    Ziqian DENG

    2018-04-01

    Full Text Available Plasma spray-physical vapor deposition (PS-PVD as a novel coating process based on low-pressure plasma spray (LPPS has been significantly used for thermal barrier coatings (TBCs. A coating can be deposited from liquid splats, nano-sized clusters, and the vapor phase forming different structured coatings, which shows obvious advantages in contrast to conventional technologies like atmospheric plasma spray (APS and electron beam-physical vapor deposition (EB-PVD. In addition, it can be used to produce thin, dense, and porous ceramic coatings for special applications because of its special characteristics, such as high power, very low pressure, etc. These provide new opportunities to obtain different advanced microstructures, thus to meet the growing requirements of modern functional coatings. In this work, focusing on exploiting the potential of gas-phase deposition from PS-PVD, a series of 7YSZ coating experiments with various process conditions was performed in order to better understand the deposition process in PS-PVD, where coatings were deposited on different substrates including graphite and zirconia. Meanwhile, various substrate temperatures were investigated for the same substrate. As a result, a deposition mechanism of heterogeneous nucleation has been presented showing that surface energy is an important influencing factor for coating structures. Besides, undercooling of the interface between substrate and vapor phase plays an important role in coating structures. Keywords: 7YSZ, Deposition mechanism, Heterogeneous nucleation, PS-PVD, TBC

  5. Effect of Temperature on Nucleation of Nanocrystalline Indium Tin Oxide Synthesized by Electron-Beam Evaporation

    Science.gov (United States)

    Shen, Yan; Zhao, Yujun; Shen, Jianxing; Xu, Xiangang

    2017-07-01

    Indium tin oxide (ITO) has been widely applied as a transparent conductive layer and optical window in light-emitting diodes, solar cells, and touch screens. In this paper, crystalline nano-sized ITO dendrites are obtained using an electron-beam evaporation technique. The surface morphology of the obtained ITO was studied for substrate temperatures of 25°C, 130°C, 180°C, and 300°C. Nano-sized crystalline dendrites were synthesized only at a substrate temperature of 300°C. The dendrites had a cubic structure, confirmed by the results of x-ray diffraction and transmission electron microscopy. The growth mechanism of the nano-crystalline dendrites could be explained by a vapor-liquid-solid (VLS) growth model. The catalysts of the VLS process were indium and tin droplets, confirmed by varying the substrate temperature, which further influenced the nucleation of the ITO dendrites.

  6. Comparative study of tantalum deposition by chemical vapor deposition and electron beam vacuum evaporation

    International Nuclear Information System (INIS)

    Spitz, J.; Chevallier, J.

    1975-01-01

    The coating by tantalum of steel parts has been carried out by the two following methods: chemical vapor deposition by hydrogen reduction of TaCl 5 (temperature=1100 deg C, pressure=200 mmHg, H 2 /TaCl 5 =10); electron beam vacuum evaporation. In this case Ta was firstly condensed by ion plating (P(Ar)=5x10 -3 up to 2x10 -2 mmHg; U(c)=3 to -4kV and J(c)=0.2 to 1mAcm -2 ) in order to ensure a good adhesion between deposit and substrate; then by vacuum condensation (substrate temperature: 300 to 650 deg C) to ensure that the coating is impervious to HCl an H 2 SO 4 acids. The advantages and inconveniences of each method are discussed [fr

  7. Pulsed hollow cathode discharge: intense electron beam and filamentary plasma

    International Nuclear Information System (INIS)

    Modreanu, Gabriel

    1998-01-01

    This work deals with a transient hollow cathode discharge optimised by a preionization one and providing intense electron beams. It exists a preionization current value for which the pulsed discharge becomes a very straight and bright filament, well collimated on the discharge tube axis for some tenths of centimeters. A remarkable feature of this discharge is that, without internal metallic electrodes very pure plasma could be produced. Using self-biasing by the beam of a Faraday cup placed only few millimeters behind the anode, we deduced the beam electron's distribution function and its temporal behavior for two radial positions, on the axis and 1 millimeter off-axis, respectively. The real advantage of this measurement technique is the transient polarization character, which allows analysis very closely from the electron beam extraction hole. On the other side, using the emission spectroscopy, we have studied the plasma produced in electron beam - gas interaction and deduced the temporal evolution of the electron temperature. The temporal behavior of the filamentary plasma diameter shows a constriction at the last moments of the beam existence, followed by diffusion controlled expansion. The ambipolar diffusion coefficient corresponding to the estimated electron temperature describes quite well this expansion and allows a quantitative interpretation of the measured temperature diminution, with taking into account the preferential fast electrons escape. The analysis of both beam and post-beam plasma phases suggests potential applications of this robust, very reproducible and not expensive discharge also susceptible to be external monitored. The beam - target interaction could be used for PVD, elementary analysis and filamentary or point-like X-ray emission. (author) [fr

  8. Electron-beam deposition of vanadium dioxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Marvel, R.E.; Appavoo, K. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Choi, B.K. [Vanderbilt University, Department of Electrical Engineering and Computer Science, Nashville, TN (United States); Nag, J. [Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States); Haglund, R.F. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Vanderbilt University, Institute for Nanoscale Science and Engineering, Nashville, TN (United States); Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States)

    2013-06-15

    Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass. (orig.)

  9. Effect of Annealing Temperature on CuInSe2/ZnS Thin-Film Solar Cells Fabricated by Using Electron Beam Evaporation

    Directory of Open Access Journals (Sweden)

    H. Abdullah

    2013-01-01

    Full Text Available CuInSe2 (CIS thin films are successfully prepared by electron beam evaporation. Pure Cu, In, and Se powders were mixed and ground in a grinder and made into a pellet. The pallets were deposited via electron beam evaporation on FTO substrates and were varied by varying the annealing temperatures, at room temperature, 250°C, 300°C, and 350°C. Samples were analysed by X-ray diffractometry (XRD for crystallinity and field-emission scanning electron microscopy (FESEM for grain size and thickness. I-V measurements were used to measure the efficiency of the CuInSe2/ZnS solar cells. XRD results show that the crystallinity of the films improved as the temperature was increased. The temperature dependence of crystallinity indicates polycrystalline behaviour in the CuInSe2 films with (1 1 1, (2 2 0/(2 0 4, and (3 1 2/(1 1 6 planes at 27°, 45°, and 53°, respectively. FESEM images show the homogeneity of the CuInSe2 formed. I-V measurements indicated that higher annealing temperatures increase the efficiency of CuInSe2 solar cells from approximately 0.99% for the as-deposited films to 1.12% for the annealed films. Hence, we can conclude that the overall cell performance is strongly dependent on the annealing temperature.

  10. An apparatus for sequential pulsed plasma beam treatment in combination with Arc PVD deposition

    International Nuclear Information System (INIS)

    Stanislawski, J.; Werner, Z.; Piekoszewski, J.; Richter, E.

    2002-01-01

    A hybrid type of apparatus is described which enables one to form a thin multi-layer film on the surface of any kind of solid substrate. In one process, the surface is treated with a high intensity pulse plasma beam which introduces the chosen kind of atoms into the near-surface layer of the substrate. In the second process, following the first without breaking the vacuum, the coating is formed by arc PVD (physics vapour deposition) process. Two examples of coatings formed on metallic and ceramic substrates are presented. (author)

  11. Thermal conductivity issues of EB-PVD thermal barrier coatings

    Energy Technology Data Exchange (ETDEWEB)

    Schulz, U.; Raetzer-Scheibe, H.J.; Saruhan, B. [DLR - German Aerospace Center, Institute of Materials Research, 51170 Cologne (Germany); Renteria, A.F. [BTU, Physical Metallurgy and Materials Technology, Cottbus (Germany)

    2007-09-15

    The thermal conductivity of electron-beam physical vapor deposited (EB-PVD) thermal barrier coatings (TBCs) was investigated by the Laser Flash technique. Sample type and methodology of data analyses as well as atmosphere during the measurement have some influence on the data. A large variation of the thermal conductivity was found by changes in TBC microstructure. Exposure at high temperature caused sintering of the porous microstructure that finally increased thermal conductivity up to 30 %. EB-PVD TBCs show a distinct thickness dependence of the thermal conductivity due to the anisotropic microstructure in thickness direction. Thin TBCs had a 20 % lower thermal conductivity than thick coatings. New compositions of the ceramic top layer offer the largest potential to lower thermal conductivity. Values down to 0.8W/(mK) have been already demonstrated with virgin coatings of pyrochlore compositions. (Abstract Copyright [2007], Wiley Periodicals, Inc.) [German] Die Waermeleitfaehigkeit von elektronenstrahl-aufgedampften (EB-PVD) Waermedaemmschichten (TBCs) wurde mittels Laser-Flash untersucht. Probentyp, Messmethodik und die Atmosphaere waehrend der Messung haben einen Einfluss auf die Ergebnisse. Aenderungen in der Mikrostruktur der TBC fuehrten zu grossen Unterschieden der Waermeleitfaehigkeit. Eine Hochtemperaturbelastung verursachte Sintervorgaenge in der poroesen Mikrostruktur, was die Waermeleitfaehigkeit um bis zu 30 % ansteigen liess. EB-PVD TBCs zeigen eine deutliche Dickenabhaengigkeit der Waermeleitfaehigkeit durch die Anisotropie der Mikrostruktur in dieser Richtung. Duenne TBCs haben eine um 20 % geringere Waermeleitfaehigkeit als dicke Schichten. Neue Zusammensetzungen der keramischen Deckschicht bieten die groessten Moeglichkeiten fuer eine Reduktion der Waermeleitfaehigkeit. Werte bis zu 0,8 W/(mK) wurden damit bereits erreicht. (Abstract Copyright [2007], Wiley Periodicals, Inc.)

  12. Simultaneous Co-deposition of Zn-Mg Alloy Layers on Steel Strip by PVD Process

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Tae Yeob [POSCO Technical Research Laboratories, Gwangyang (Korea, Republic of); Goodenough, Mark [Strategic Marketing, Tata Steel, Warwickshire (United Kingdom)

    2011-12-15

    This is the first release of an interim report on the development of coating technology of Zn-Mg alloy layers on steel strip by EML-PVD (electromagnetic levitation - physical vapor deposition) process in an air-to-air type continuous PVD pilot plant. It intends to introduce a basic principle of the EML-PVD process together with the high speed PVD pilot plant built in Posco. Due to the agitation effect provided by the high frequency induction coil, simultaneous evaporation of Zn and Mg from a droplet could produce alloy coating layers with Mg content of 6% to 12% depending on the composition of the droplet inside the coil. For its superior corrosion resistance, Zn-Mg alloy coated steel would be a very promising material for automotive, electrical appliances, and construction applications.

  13. Simultaneous Co-deposition of Zn-Mg Alloy Layers on Steel Strip by PVD Process

    International Nuclear Information System (INIS)

    Kim, Tae Yeob; Goodenough, Mark

    2011-01-01

    This is the first release of an interim report on the development of coating technology of Zn-Mg alloy layers on steel strip by EML-PVD (electromagnetic levitation - physical vapor deposition) process in an air-to-air type continuous PVD pilot plant. It intends to introduce a basic principle of the EML-PVD process together with the high speed PVD pilot plant built in Posco. Due to the agitation effect provided by the high frequency induction coil, simultaneous evaporation of Zn and Mg from a droplet could produce alloy coating layers with Mg content of 6% to 12% depending on the composition of the droplet inside the coil. For its superior corrosion resistance, Zn-Mg alloy coated steel would be a very promising material for automotive, electrical appliances, and construction applications

  14. Tribological Behavior of Coating Cr Layer on 40Cr after Surface Electron Beam Pretreatment

    Science.gov (United States)

    Hu, J. J.; Wang, J.; Jiang, P.; Xu, H. B.; Li, H.; Hou, T. F.

    2017-12-01

    In this study,the friction and wear behavior of PVD coatings which were treated by 5 different processes,based on gear material-40Cr. Analyzing the effects of treating the gear material with electron beam in combination with magnetron sputtering on it,for dry friction and wear properties.The result showed that the electron beam pretreated substrate was useful to improve the tribological performance of coating material.Furthermore, the surface roughness of coating, the bonding force between substrate and coating as well as the load are the main factors affecting the tribological performance of this coating. Most importantly, the contribution of plowing effect on friction coefficient should be considered when the surface roughness is high.

  15. Structural, optical, and photoluminescence characterization of electron beam evaporated ZnS/CdSe nanoparticles thin films

    Science.gov (United States)

    Mohamed, S. H.; Ali, H. M.

    2011-01-01

    Structural, optical, and photoluminescence investigations of ZnS capped with CdSe films prepared by electron beam evaporation are presented. X-ray diffraction analysis revealed that the ZnS/CdSe nanoparticles films contain cubic cadmium selenide and hexagonal zinc sulfide crystals and the ZnS grain sizes increased with increasing ZnS thickness. The refractive index was evaluated in terms of envelope method, which has been suggested by Swanepoel in the transparent region. The refractive index values were found to increase with increasing ZnS thickness. However, the optical band gap and the extinction coefficient were decreased with increasing ZnS thickness. Photoluminescence (PL) investigations revealed the presence of two broad emission bands. The ZnS thickness significantly influenced the PL intensities.

  16. Ion assistance effects on electron beam deposited MgF sub 2 films

    CERN Document Server

    Alvisi, M; Della Patria, A; Di Giulio, M; Masetti, E; Perrone, M R; Protopapa, M L; Tepore, A

    2002-01-01

    Thin films of MgF sub 2 have been deposited by the ion-assisted electron-beam evaporation technique in order to find out the ion beam parameters leading to films of high laser damage threshold whose optical properties are stable under uncontrolled atmosphere conditions. It has been found that the ion-assisted electron-beam evaporation technique allows getting films with optical properties (refraction index and extinction coefficient) of high environmental stability by properly choosing the ion-source voltage and current. But, the laser damage fluence at 308 nm was quite dependent on the assisting ion beam parameters. Larger laser damage fluences have been found for the films deposited by using assisting ion beams delivered at lower anode voltage and current values. It has also been found that the films deposited without ion assistance were characterized by the highest laser damage fluence (5.9 J/cm sup 2) and the lowest environmental stability. The scanning electron microscopy analysis of the irradiated areas...

  17. Experimental study of the evaporation and expansion of a solid pellet in a plasma heated by an electron beam

    International Nuclear Information System (INIS)

    Akent'ev, R.Yu.; Arzhannikov, A.V.; Astrelin, V.T.; Burdakov, A.V.; Ivanov, I.A.; Kojdan, V.S.; Mekler, K.I.; Polosatkin, S.V.; Postupaev, V.V.; Rovenskikh, A.F.; Sinitskij, S.L.

    2004-01-01

    The results of experiments on the solid pellets injection into the plasma, heated by an electron beam at the GOL-3 facility, are presented. The polyethylene pellets with the mass of 0.1-1 mg and lithium deuteride pellets with the mass of 0.02-0.5 mg were used. The dense plasma bunch, scattering at first spherically, is formed during several microseconds after the beginning of the electron beam injection into the plasma. Thereafter the bunch periphery is heated and becomes magnetized. Further there takes place the expansion of the dense plasma along the magnetic field on the order of 300 km/s. Comparison of the observed values with the calculations by the hydrodynamic model indicates, that for explaining such a rate of the bunch expansion the density of the total energy, falling on the pellet, should be ∼1 kJ/cm 2 . This value exceeds the corresponding value for the main plasma, i.e. there is observed the energy concentration across the magnetic field into the dense bunch of the evaporated macroparticle [ru

  18. Sintering and microstructure evolution of columnar nickel-based superalloy sheets prepared by EB-PVD

    International Nuclear Information System (INIS)

    Chen, S.; Qu, S.J.; Liang, J.; Han, J.C.

    2010-01-01

    Research highlights: → EB-PVD technology is commonly used to deposit thermal barrier coatings (TBCs) and columnar structure is commonly seen in EB-PVD condensates. The unique columnar structure can provide outstanding resistance against thermal shock and mechanical strains for TBCs. However, a number of researchers have found that the columnar structure can affect the mechanical properties of EB-PVD alloy thin sheet significantly. As yet, works on how to reduce this kind of effects are seldom done. In the present article, we tried to reveal the sintering effects on microstructure evolution and mechanical properties of columnar Ni-based superalloy sheet. The results suggests that after sintering, the columnar structure degrades. Degradation depends on sintering temperature and time. Both the ultimate tensile strength and the elongation percentage are effectively improved after sintering. - Abstract: A ∼0.15 mm-thick columnar nickel-based superalloy sheet was obtained by electron beam physical vapor deposition (EB-PVD). The as-deposited alloy sheet was sintered at different conditions. The microstructure of the specimens before and after sintering was characterized by using scanning electron microscopy. An X'Pert texture facility was used to determine the crystallographic orientation of the as-deposited alloy sheet. The phase transformation was investigated by X-ray diffraction. Tensile tests were conducted at room temperature on as-deposited and sintered specimens. The results show that the as-deposited sheet is composed of typical columnar structures. After sintering, however, the columnar structure degrades. The degradation depends on sintering temperature and time. Both the ultimate tensile strength and the elongation percentage are effectively improved after sintering.

  19. Generation and transportation of low-energy, high-current electron beams

    International Nuclear Information System (INIS)

    Ozur, G.E.; Proskurovskij, D.I.; Nazarov, D.S.

    1996-01-01

    Experimental data on the production of low-energy, high-current electron beams in a plasma-filled diode are presented. The highest beam energy density achieved is about 40 J/cm 2 , which makes it possible to treat materials in the mode of intense evaporation of the surface layer. It was shown that the use of a hollow cathode improves the beam homogeneity. The feasibility was demonstrated of the production of low-energy high-current electron beams in a gun with plasma anode based on the use of a reflective discharge. (author). 6 figs., 6 refs

  20. A variable electron beam and its irradiation effect on optical and ...

    Indian Academy of Sciences (India)

    A low energy electron accelerator has been constructed and tested. The electron beam can operate in low energy mode (100 eV to 10 keV) having a beam diameter of 8–10 mm. Thin films of CdS having thickness of 100 nm deposited on ITO-coated glass substrate by thermal evaporation method have been irradiated by ...

  1. Runaway electrons beams in ITER disruptions

    International Nuclear Information System (INIS)

    Fleischmann, H.H.

    1993-01-01

    In agreement with the initial projections, the potential generation of runaway beams in disruptions of ITER discharges was performed. This analysis was based on the best-available present projections of plasma parameters existing in large-tokamak disruptions. Using these parameters, the potential contributions from various basic mechanisms for the generation of runway electrons were estimated. The envisioned mechanisms included (i) the well-known Dreicer process (assuming an evaporation of the runways from the thermal distribution), (ii) the seeding of runaway beams resulting from the potential presence of trapped high-temperature electrons from the original discharge still remaining in the disruption plasma at time of reclosure of the magnetic surfaces, and (iii) the generation of runaway beams through avalanche exponentiation of low-level seed runaways resulting via close collisions of existing runaways with cold plasma electrons. Finally, the prospective behavior of the any generated runaway beams -- in particular during their decay -- as well as their potential avoidance and/or damage controlled extraction through the use of magnetic perturbation fields also was considered in some detail

  2. Angular distributions of atomic vapor stream produced by electron beam heating

    International Nuclear Information System (INIS)

    Ohba, Hironori; Amekawa, Kazuhiro; Shibata, Takemasa

    1997-03-01

    The angular distributions were measured as a function of deposition rate for aluminium, copper, gadolinium and cerium vapor stream produced by an electron beam gun with water-cooled copper crucible. The distributions were recorded on the mounted on a semicircular (120mm in radius) mask over the evaporation source. The measured distributions were able to be described by a simple cosine law, that is cos n θ, except for the case of extremely high evaporation rate with a porous material, where n is a rate-dependent beaming exponent, θ is the angle from the vertical. For many kinds of evaporants, it was confirmed that the beaming exponents increase continuously from unity to 3 or 4 with increasing deposition rate and are approximately proportional to R 0.25 where R is the deposition rate. Moreover, it was found that the beaming exponents n are able to be expressed as n = α Kn 0 -0.25 , where Kn 0 -1 is the inverse of Knudsen number, which is defined by the mean free path of evaporated atoms and the evaporation spot size, and α is the constant. (author)

  3. Angular distributions of atomic vapor stream produced by electron beam heating

    Energy Technology Data Exchange (ETDEWEB)

    Ohba, Hironori; Amekawa, Kazuhiro; Shibata, Takemasa [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

    1997-03-01

    The angular distributions were measured as a function of deposition rate for aluminium, copper, gadolinium and cerium vapor stream produced by an electron beam gun with water-cooled copper crucible. The distributions were recorded on the mounted on a semicircular (120mm in radius) mask over the evaporation source. The measured distributions were able to be described by a simple cosine law, that is cos{sup n} {theta}, except for the case of extremely high evaporation rate with a porous material, where n is a rate-dependent beaming exponent, {theta} is the angle from the vertical. For many kinds of evaporants, it was confirmed that the beaming exponents increase continuously from unity to 3 or 4 with increasing deposition rate and are approximately proportional to R{sup 0.25} where R is the deposition rate. Moreover, it was found that the beaming exponents n are able to be expressed as n = {alpha} Kn{sub 0}{sup -0.25}, where Kn{sub 0}{sup -1} is the inverse of Knudsen number, which is defined by the mean free path of evaporated atoms and the evaporation spot size, and {alpha} is the constant. (author)

  4. Laser-evaporated pulsed atomic beam and its application

    International Nuclear Information System (INIS)

    Zhang Yanping; Hu Qiquan; Su Haizheng; Lin Fucheng

    1986-01-01

    For the purpose of obtaining an atomic beam, laser-evaporated atomic vapor was studied experimentally. The signals of multiphoton ionization of refractory metal atoms obtained with the pulsed atomic beam were observed, and the problem associated with the detection of these signals was discussed

  5. Generation and transportation of low-energy, high-current electron beams

    Energy Technology Data Exchange (ETDEWEB)

    Ozur, G E; Proskurovskij, D I; Nazarov, D S [Russian Academy of Sciences, Tomsk (Russian Federation). Institute of High Current Electronics

    1997-12-31

    Experimental data on the production of low-energy, high-current electron beams in a plasma-filled diode are presented. The highest beam energy density achieved is about 40 J/cm{sup 2}, which makes it possible to treat materials in the mode of intense evaporation of the surface layer. It was shown that the use of a hollow cathode improves the beam homogeneity. The feasibility was demonstrated of the production of low-energy high-current electron beams in a gun with plasma anode based on the use of a reflective discharge. (author). 6 figs., 6 refs.

  6. WEBEXPIR: Windowless target electron beam experimental irradiation

    International Nuclear Information System (INIS)

    Dierckx, Marc; Schuurmans, Paul; Heyse, Jan; Rosseel, Kris; Tichelen, Katrien Van; Nactergal, Benoit; Vandeplassche, Dirk; Aoust, Thierry; Abs, Michel; Guertin, Arnaud; Buhour, Jean-Michel; Cadiou, Arnaud; Abderrahim, Hamid Ait

    2008-01-01

    The windowless target electron beam experimental irradiation (WEBEXPIR) program was set-up as part of the MYRRHA/XT-ADS R and D effort on the spallation target design to investigate the interaction of a proton beam with a liquid lead-bismuth eutectic (LBE) free surface. In particular, possible free surface distortion or shockwave effects in nominal conditions and during sudden beam on/off transient situations, as well as possible enhanced evaporation were assessed. An experiment was conceived at the IBA TT-1000 Rhodotron, where a 7 MeV electron beam was used to simulate the high power deposition at the MYRRHA/XT-ADS LBE free surface. The geometry and the LBE flow characteristics in the WEBEXPIR set-up were made as representative as possible of the actual situation in the MYRRHA/XT-ADS spallation target. Irradiation experiments were carried out at beam currents of up to 10 mA, corresponding to 40 times the nominal beam current necessary to reproduce the MYRRHA/XT-ADS conditions. Preliminary analyses show that the WEBEXPIR free surface flow was not disturbed by the interaction with the electron beam and that vacuum conditions stayed well within the design specifications

  7. Low temperature and self catalytic growth of ultrafine ITO nanowires by electron beam evaporation method and their optical and electrical properties

    International Nuclear Information System (INIS)

    Kumar, R. Rakesh; Rao, K. Narasimha; Rajanna, K.; Phani, A.R.

    2014-01-01

    Highlights: • ITO nanowires were grown by e-beam evaporation method. • ITO nanowires growth done at low substrate temperature of 350 °C. • Nanowires growth was carried out without use of catalyst and reactive oxygen gas. • Nanowires growth proceeds via self catalytic VLS growth. • Grown nanowires have diameter 10–20 nm and length 1–4 μm long. • ITO nanowire films have shown good antireflection property. - Abstract: We report the self catalytic growth of Sn-doped indium oxide (ITO) nanowires (NWs) over a large area glass and silicon substrates by electron beam evaporation method at low substrate temperatures of 250–400 °C. The ITO NWs growth was carried out without using an additional reactive oxygen gas and a metal catalyst particle. Ultrafine diameter (∼10–15 nm) and micron long ITO NWs growth was observed in a temperature window of 300–400 °C. Transmission electron microscope studies confirmed single crystalline nature of the NWs and energy dispersive spectroscopy studies on the NWs confirmed that the NWs growth proceeds via self catalytic vapor-liquid-solid (VLS) growth mechanism. ITO nanowire films grown on glass substrates at a substrate temperature of 300–400 °C have shown ∼2–6% reflection and ∼70–85% transmission in the visible region. Effect of deposition parameters was systematically investigated. The large area growth of ITO nanowire films would find potential applications in the optoelectronic devices

  8. Simulation of multicomponent losses in electron beam melting and refining at varying scan frequencies

    International Nuclear Information System (INIS)

    Powell, A.; Szekely, J.; Van Den Avyle, J.; Damkroger, B.

    1995-01-01

    A two-stage model is presented to describe alloy element evaporation rates from molten metal due to transient local heating by an electron beam. The first stage is a simulation of transient phenomena near the melt surface due to periodic heating by a scanning beam, the output of which is the relationship between operating parameters, surface temperature, and evaporation rate. At high scan rates, this can be done using a simple one-dimensional heat transfer model of the surface layer; at lower scan rates, a more complex three-dimensional model with fluid flow and periodic boundary conditions is necessary. The second stage couples this evaporation-surface temperature relationship with a larger steady state heat transfer and fluid flow model of an entire melting hearth or mold, in order to calculate local and total evaporation rates. Predictions are compared with experimental results from Sandia's 310-kW electron beam melting furnace, in which evaporation rates and vapor compositions were studied in pure titanium and Ti-6%Al-4%V alloy. Evaporation rates were estimated from rate of condensation on a substrate held over the hearth, and were characterized as a function of beam power (150 and 225 kW), scan frequency (30, 115 and 450 Hz) and background pressure (10 -3 , 10 -4 and 10 -5 torr)

  9. Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings

    Science.gov (United States)

    Harder, Bryan J.; Zhu, Dongming

    2011-01-01

    In order to generate advanced multilayer thermal and environmental protection systems, a new deposition process is needed to bridge the gap between conventional plasma spray, which produces relatively thick coatings on the order of 125-250 microns, and conventional vapor phase processes such as electron beam physical vapor deposition (EB-PVD) which are limited by relatively slow deposition rates, high investment costs, and coating material vapor pressure requirements. The use of Plasma Spray - Physical Vapor Deposition (PS-PVD) processing fills this gap and allows thin (deposited and multilayer coatings of less than 100 microns to be generated with the flexibility to tailor microstructures by changing processing conditions. Coatings of yttria-stabilized zirconia (YSZ) were applied to NiCrAlY bond coated superalloy substrates using the PS-PVD coater at NASA Glenn Research Center. A design-of-experiments was used to examine the effects of process variables (Ar/He plasma gas ratio, the total plasma gas flow, and the torch current) on chamber pressure and torch power. Coating thickness, phase and microstructure were evaluated for each set of deposition conditions. Low chamber pressures and high power were shown to increase coating thickness and create columnar-like structures. Likewise, high chamber pressures and low power had lower growth rates, but resulted in flatter, more homogeneous layers

  10. A chemically stable PVD multilayer encapsulation for lithium microbatteries

    International Nuclear Information System (INIS)

    Ribeiro, J F; Sousa, R; Cunha, D J; Vieira, E M F; Goncalves, L M; Silva, M M; Dupont, L

    2015-01-01

    A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO 2 ) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si 3 N 4 ). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber. (paper)

  11. A chemically stable PVD multilayer encapsulation for lithium microbatteries

    Science.gov (United States)

    Ribeiro, J. F.; Sousa, R.; Cunha, D. J.; Vieira, E. M. F.; Silva, M. M.; Dupont, L.; Goncalves, L. M.

    2015-10-01

    A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO2) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si3N4). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber.

  12. Electron beam silicon purification

    Energy Technology Data Exchange (ETDEWEB)

    Kravtsov, Anatoly [SIA ' ' KEPP EU' ' , Riga (Latvia); Kravtsov, Alexey [' ' KEPP-service' ' Ltd., Moscow (Russian Federation)

    2014-11-15

    Purification of heavily doped electronic grade silicon by evaporation of N-type impurities with electron beam heating was investigated in process with a batch weight up to 50 kilos. Effective temperature of the melt, an indicative parameter suitable for purification process characterization was calculated and appeared to be stable for different load weight processes. Purified material was successfully approbated in standard CZ processes of three different companies. Each company used its standard process and obtained CZ monocrystals applicable for photovoltaic application. These facts enable process to be successfully scaled up to commercial volumes (150-300 kg) and yield solar grade silicon. (copyright 2014 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. PVD processes of thin films deposition using Hall-current discharge

    International Nuclear Information System (INIS)

    Svadkovskij, I.V.

    2007-01-01

    Results of research and developments in the field of PVD processes of thin films deposition using Hall-current discharge have been summarized. Effects of interaction of ions with surface during deposition have been considered. Also features of application and prospects of devices based on ion beam and magnetron sputtering systems in thin films technologies have been analyzed. The aspects in the field plasma physics, technology and equipment plasma PVD processes of thin films deposition have been systematized, on the base of investigations made by author and other scientists. (authors)

  14. Influence of annealing temperature on Raman and photoluminescence spectra of electron beam evaporated TiO₂ thin films.

    Science.gov (United States)

    Vishwas, M; Narasimha Rao, K; Chakradhar, R P S

    2012-12-01

    Titanium dioxide (TiO(2)) thin films were deposited on fused quartz substrates by electron beam evaporation method at room temperature. The films were annealed at different temperatures in ambient air. The surface morphology/roughness at different annealing temperatures were analyzed by atomic force microscopy (AFM). The crystallinity of the film has improved with the increase of annealing temperature. The effect of annealing temperature on optical, photoluminescence and Raman spectra of TiO(2) films were investigated. The refractive index of TiO(2) films were studied by envelope method and reflectance spectra and it is observed that the refractive index of the films was high. The photoluminescence intensity corresponding to green emission was enhanced with increase of annealing temperature. The peaks in Raman spectra depicts that the TiO(2) film is of anatase phase after annealing at 300°C and higher. The films show high refractive index, good optical quality and photoluminescence characteristics suggest that possible usage in opto-electronic and optical coating applications. Copyright © 2012 Elsevier B.V. All rights reserved.

  15. Structure and magnetic properties of Fe doped In{sub 2}O{sub 3} thin films prepared by electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Krishna, N. Sai; Kaleemulla, S., E-mail: skaleemulla@gmail.com; Rao, N. Madhusudhana; Krishnamoorthi, C.; Begam, M. Rigana [Thin Films Laboratory, School of Advanced Sciences, VIT University, Vellore – 632014 (India); Amarendra, G. [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); UGC-DAE-CSR, Kalpakkam Node, Kokilamedu, Tamilnadu -603104 (India)

    2015-06-24

    Pure and Fe (7 at.%) doped In{sub 2}O{sub 3} thin films were grown onto the glass substrates by electron beam evaporation technique. The structural and magnetic properties of the pure and Fe doped In{sub 2}O{sub 3} thin films have been studied. The undoped and Fe doped In{sub 2}O{sub 3} thin films shown ferromagnetic property at room temperature. A magnetization of 24 emu/cm{sup 3} was observed for pure In{sub 2}O{sub 3} thin films. The magnetization of 38.23 emu/cm{sup 3} was observed for the Fe (7 at.%) doped In{sub 2}O{sub 3} thin films.

  16. Optimization of the optical and electrical properties of electron beam evaporated aluminum-doped zinc oxide films for opto-electronic applications

    Science.gov (United States)

    Ali, H. M.; Abd El-Raheem, M. M.; Megahed, N. M.; Mohamed, H. A.

    2006-08-01

    Aluminum-doped zinc oxide (AZO) thin films have been deposited by electron beam evaporation technique on glass substrates. The structural, electrical and optical properties of AZO films have been investigated as a function of annealing temperature. It was observed that the optical properties such as transmittance, reflectance, optical band gap and refractive index of AZO films were strongly affected by annealing temperature. The transmittance values of 84% in the visible region and 97% in the NIR region were obtained for AZO film annealed at 475 °C. The room temperature electrical resistivity of 4.6×10-3 Ω cm has been obtained at the same temperature of annealing. It was found that the calculated refractive index has been affected by the packing density of the thin films, whereas, the high annealing temperature gave rise to improve the homogeneity of the films. The single-oscillator model was used to analyze the optical parameters such as the oscillator and dispersion energies.

  17. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation

    Science.gov (United States)

    Ristau, Detlev; Gunster, Stefan; Bosch, Salvador; Duparre, Angela; Masetti, Enrico; Ferre-Borrull, Josep; Kiriakidis, George; Peiro, Francesca; Quesnel, Etienne; Tikhonravov, Alexander

    2002-06-01

    Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by ion-beam sputtering (IBS) as well as by boat and electron beam (e-beam) evaporation and were characterized by a variety of complementary analytical techniques. Besides undergoing photometric and ellipsometric inspection, the samples were investigated at 193 and 633 nm by an optical scatter measurement facility. The structural properties were assessed with atomic-force microscopy, x-ray diffraction, TEM techniques that involved conventional thinning methods for the layers. For measurement of mechanical stress in the coatings, special silicon substrates were coated and analyzed. The dispersion behavior of both deposition materials, which was determined on the basis of various independent photometric measurements and data reduction techniques, is in good agreement with that published in the literature and with the bulk properties of the materials. The refractive indices of the MgF2 coatings ranged from 1.415 to 1.440 for the wavelength of the ArF excimer laser (193 nm) and from 1.435 to 1.465 for the wavelength of the F2 excimer laser (157 nm). For single layers of LaF3 the refractive indices extended from 1.67 to 1.70 at 193 nm to approx1.80 at 157 nm. The IBS process achieves the best homogeneity and the lowest surface roughness values (close to 1 nmrms) of the processes compared in the joint experiment. In contrast to MgF2 boat and e-beam evaporated coatings, which exhibit tensile mechanical stress ranging from 300 to 400 MPa, IBS coatings exhibit high compressive stress of as much as 910 MPa. A similar tendency was found for coating stress in LaF3 single layers. Experimental results are discussed with respect to the microstructural and compositional properties as well as to the surface topography of the coatings.

  18. Methods to improve the PVD coatability of brass by using diffusion barriers

    Science.gov (United States)

    Langer, Bernd

    Previous work involving PVD coatings on brass has used a combination of multilayers consisting of electroplated films like nickel or chromium and deposited decorative PVD coatings like TiN, TiAIN or ZrN systems. The disadvantages of these systems are the combination of wet electrochemistry and high tech vacuum processes. Furthermore the allergic reaction to nickel and the toxic nature of Cr(VI) must be considered.There is a need for intermediate layers to 'seal-off the brass in order to avoid the evaporation of zinc in vacuum using a diffusion barrier. Furthermore the intermediate layers are required to act as a corrosion barrier.This thesis reports on the development of PVD coatings on heat sensitive brass substrate materials utilising ABS technology with Al, CuAl8 and Nb targets as vapour sources.The brass pretreatment includes careful grinding, polishing and cleaning steps as well as steered arc metal ion etching using the above target materials. The coatings are produced at temperatures between 100 and 250°C in the unbalanced magnetron mode, including layers made from Al, Al-Nb, CuA18, CuAl8-Nb and Nb.Scratch adhesion and Rockwell indentation tests are found not to be directly applicable to the system of soft brass and ductile coating(s). Therefore a new classification for both scratch and indentation tests was defined. The best adhesion was shown by the CuA18 coatings on brass. Corrosion tests showed good results for the Al coatings and poor results for the pure Nb coatings directly applied on brass. The best corrosion result was obtained with a CuAl8-Nb layer system. This layer system also offers very good barrier behaviour concerning Zn diffusion.Other investigations like Glow Discharge Optical Emission Spectroscopy (GDOES), Scanning Electron Microscopy (SEM) imaging, Transmission Electron Microscopy (TEM) and X-ray Diffraction (XRD) were undertaken to characterise the new coating systems for brass.

  19. Influence of electron evaporative cooling on ultracold plasma expansion

    International Nuclear Information System (INIS)

    Wilson, Truman; Chen, Wei-Ting; Roberts, Jacob

    2013-01-01

    The expansion of ultracold neutral plasmas (UCP) is driven primarily by the thermal pressure of the electron component and is therefore sensitive to the electron temperature. For typical UCP spatial extents, evaporative cooling has a significant influence on the UCP expansion rate at lower densities (less than 10 8 /cm 3 ). We studied the effect of electron evaporation in this density range. Owing to the low density, the effects of three-body recombination were negligible. We modeled the expansion by taking into account the change in electron temperature owing to evaporation as well as adiabatic expansion and found good agreement with our data. We also developed a simple model for initial evaporation over a range of ultracold plasma densities, sizes, and electron temperatures to determine over what parameter range electron evaporation is expected to have a significant effect. We also report on a signal calibration technique, which relates the signal at our detector to the total number of ions and electrons in the ultracold plasma

  20. Conductance enhancement due to interface magnons in electron-beam evaporated MgO magnetic tunnel junctions with CoFeB free layer deposited at different pressure

    Energy Technology Data Exchange (ETDEWEB)

    Guo, P.; Yu, G. Q.; Wei, H. X.; Han, X. F., E-mail: jiafengfeng@aphy.iphy.ac.cn, E-mail: xfhan@aphy.iphy.ac.cn [Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China); Li, D. L.; Feng, J. F., E-mail: jiafengfeng@aphy.iphy.ac.cn, E-mail: xfhan@aphy.iphy.ac.cn [Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China); CRANN and School of Physics, Trinity College, Dublin 2 (Ireland); Kurt, H. [CRANN and School of Physics, Trinity College, Dublin 2 (Ireland); Department of Engineering Physics, Istanbul Medeniyet University, 34720 Istanbul (Turkey); Chen, J. Y.; Coey, J. M. D. [CRANN and School of Physics, Trinity College, Dublin 2 (Ireland)

    2014-10-21

    Electron-beam evaporated MgO-based magnetic tunnel junctions have been fabricated with the CoFeB free layer deposited at Ar pressure from 1 to 4 mTorr, and their tunneling process has been studied as a function of temperature and bias voltage. By changing the growth pressure, the junction dynamic conductance dI/dV, inelastic electron tunneling spectrum d²I/dV², and tunneling magnetoresistance vary with temperature. Moreover, the low-energy magnon cutoff energy E{sub C} derived from the conductance versus temperature curve agrees with interface magnon energy obtained directly from the inelastic electron tunneling spectrum, which demonstrates that interface magnons are involved in the electron tunneling process, opening an additional conductance channel and thus enhancing the total conductance.

  1. Erosion behaviour of physically vapour-deposited and chemically vapour-deposited SiC films coated on molybdenum during oxygenated argon beam thinning

    International Nuclear Information System (INIS)

    Shikama, T.; Kitajima, M.; Fukutomi, M.; Okada, M.

    1984-01-01

    The erosion behaviour during bombardment with a 5 keV argon beam at room temperature was studied for silicon carbide (SiC) films of thickness of about 10 μm coated on molybdenum by physical vapour deposition (PVD) and chemical vapour deposition (CVD). The PVD SiC (plasma-assisted ion plating) exhibited a greater thinning rate than the CVD SiC film. Electron probe X-ray microanalysis revealed that the chemical composition of PVD SiC was changed to a composition enriched in silicon by the bombardment, and there was a notable change in its surface morphology. The CVD SiC retained its initial chemical composition with only a small change in its surface morphology. Auger electron spectroscopy indicated that silicon oxide was formed on the surface of PVD SiC by the bombardment. The greater thinning rate and easier change in chemical composition in PVD SiC could be attributed to its readier chemical reaction with oxygen due to its more non-uniform structure and weaker chemical bonding. Oxygen was present as one of the impurities in the argon beam. (Auth.)

  2. Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline palladium thin films

    Energy Technology Data Exchange (ETDEWEB)

    Amin-Ahmadi, B., E-mail: behnam.amin-ahmadi@ua.ac.be [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium); Idrissi, H. [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium); Galceran, M. [Université Libre de Bruxelles, Matters and Materials Department, 50 Av. FD Roosevelt CP194/03, 1050 Brussels (Belgium); Colla, M.S. [Institute of Mechanics, Materials and Civil Engineering, Université catholique de Louvain, Place Sainte Barbe 2, B-1348 Louvain-la-Neuve (Belgium); Raskin, J.P. [Information and Communications Technologies, Electronics and Applied Mathematics (ICTEAM), Microwave Laboratory, Université catholique de Louvain, B-1348 Louvain-la-Neuve (Belgium); Pardoen, T. [Institute of Mechanics, Materials and Civil Engineering, Université catholique de Louvain, Place Sainte Barbe 2, B-1348 Louvain-la-Neuve (Belgium); Godet, S. [Université Libre de Bruxelles, Matters and Materials Department, 50 Av. FD Roosevelt CP194/03, 1050 Brussels (Belgium); Schryvers, D. [Electron Microscopy for Materials Science (EMAT), Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium)

    2013-07-31

    The influence of the deposition rate on the formation of growth twins in nanocrystalline Pd films deposited by electron beam evaporation is investigated using transmission electron microscopy. Statistical measurements prove that twin boundary (TB) density and volume fraction of grains containing twins increase with increasing deposition rate. A clear increase of the dislocation density was observed for the highest deposition rate of 5 Å/s, caused by the increase of the internal stress building up during deposition. Based on crystallographic orientation indexation using transmission electron microscopy, it can be concluded that a {111} crystallographic texture increases with increasing deposition rate even though the {101} crystallographic texture remains dominant. Most of the TBs are fully coherent without any residual dislocations. However, for the highest deposition rate (5 Å/s), the coherency of the TBs decreases significantly as a result of the interaction of lattice dislocations emitted during deposition with the growth TBs. The analysis of the grain boundary character of different Pd films shows that an increasing fraction of high angle grain boundaries with misorientation angles around 55–65° leads to a higher potential for twin formation. - Highlights: • Fraction of twinned grains and twin boundary density increase with deposition rate. • Clear increase of dislocation density was observed for the highest deposition rate. • A moderate increase of the mean grain size with increase of deposition rate is found. • For the highest deposition rate, the twin boundaries lose their coherency. • Fraction of high angle grain boundary (55–65) increases with deposition rate.

  3. NiCoCrAl/YSZ laminate composites fabricated by EB-PVD

    International Nuclear Information System (INIS)

    Shi Guodong; Wang Zhi; Liang Jun; Wu Zhanjun

    2011-01-01

    Highlights: → The metal-ceramic laminate composites were fabricated by EB-PVD. → Both metal and ceramic layers consisted of straight columns with banded structures. → Columnar grain size was limited by the periodic layer interfaces in the laminates. → Effect of columns on fracture property was decreased by limiting layer thickness. → Laminates showed greater specific strength than monolithic metal foil. - Abstract: Two NiCoCrAl/YSZ laminate composites (A and B) with different metal-layer thickness (∼35 μm and 14 μm, respectively) were fabricated by electron beam physical vapor deposition (EB-PVD). Their microstructure was examined and their mechanical properties were compared with the 289 μm thick NiCoCrAl monolithic foil produced by EB-PVD. Both the YSZ and NiCoCrAl layers of the laminate composites had columnar grain structure. But the periodic layer interfaces limited the columnar grain size. Some pores between the columns were also observed. It was found that the strength of the laminate A was equal approximately to that of the NiCoCrAl monolithic foil, and that laminate B had the greater strength. Moreover, the density of the foils decreased with the increasing thickness ratio of YSZ/NiCoCrAl layers and the increasing the layer number. Thus, comparing with the NiCoCrAl monolithic foil, the NiCoCrAl/YSZ laminate composites not only had the equal or greater strength, but also had the much greater specific strength.

  4. Infrared waveguide fabrications with an E-beam evaporated chalcogenide glass film

    KAUST Repository

    Yang, Xiaoming

    2014-12-12

    Chalcogenide glasses have a variety of unique optical properties due to the intrinsic structural flexibility and bonds metastability. They are desirable materials for many applications, such as infrared communication sensors, holographic grating, optical imaging, and ultrafast nonlinear optic devices. Here, we introduce a novel electron-beam evaporation process to deposit the good quality arsenic trisulfide (As2S3) films and then the As2S3 films were used to fabricate the As2S3 waveguides with three approaches. The first method is photoresist lift-off. Because of the restriction of thermal budget of photoresist, the As2S3 film must be deposited at the room temperature. The second one is the silicon dioxide lift-off process on sapphire substrates, in which the As2S3 film could be evaporated at a high temperature (>180 °C) for better film quality. The third one is the plasma etching process with a metal protective thin layer in the pattern development process.

  5. Comparison of the Al back contact deposited by sputtering, e-beam, or thermal evaporation for inverted perovskite solar cells

    Science.gov (United States)

    Wahl, Tina; Hanisch, Jonas; Ahlswede, Erik

    2018-04-01

    In this work, we present inverted perovskite solar cells with Al top electrodes, which were deposited by three different methods. Besides the widely used thermal evaporation of Al, we also used the industrially important high deposition rate processes sputtering and electron beam evaporation for aluminium electrodes and examined the influence of the deposition method on the solar cell performance. The current-voltage characteristics of as grown solar cells with sputtered and e-beam Al electrode show an s-shape due to damage done to the organic electronic transport layers (ETL) during Al deposition. It can be cured by a short annealing step at a moderate temperature so that fill factors  >60% and power conversion efficiencies of almost 12% with negligible hysteresis can be achieved. While solar cells with thermally evaporated Al electrode do not show an s-shape, they also exhibit a clear improvement after a short annealing step. In addition, we varied the thickness of the ETL consisting of a double layer ([6,6]-Phenyl-C61-butyric acid methyl ester and bathocuproine) and investigated the influence on the solar cell parameters for the three different Al deposition methods, which showed distinct dependencies on ETL thickness.

  6. Techniques for evaluation of E-beam evaporative processes

    International Nuclear Information System (INIS)

    Meier, T.C.; Nelson, C.M.

    1996-01-01

    High dynamic range video imaging of the molten pool surface has provided insight regarding process responses at the melt pool liquid-vapor interface. A water-cooled video camera provides continuous high resolution imaging of the pool surface from a low angle position within 20 cm of the liquid-vapor interface. From the vantage point, the e-beam footprint is clearly defined and melt pool free surface shape can be observed. Effects of changes in a beam footprint, power distribution, and sweep frequency on pool surface shape and stability of vaporization are immediately shown. Other events observed and recorded include: formation of the pool and dissipation of ''rafts'' on the pool surface during startup, behavior of feed material as it enters the pool, effects of feed configuration changes on mixing of feed entering the pool volume and behaviors of co-evaporated materials of different vapor pressures at the feed/pool boundary. When used in conjunction with laser vapor monitoring, correlation between pool surface phenomena and vaporizer performance has been identified. This video capability was used in verifying the titanium evaporation model results presented at this conference by confirming the calculated melt pool surface deformations caused by vapor pressure of the departing evaporant at the liquid-vapor interface

  7. Techniques for evaluation of E-beam evaporative processes

    Energy Technology Data Exchange (ETDEWEB)

    Meier, T.C.; Nelson, C.M.

    1996-10-01

    High dynamic range video imaging of the molten pool surface has provided insight regarding process responses at the melt pool liquid-vapor interface. A water-cooled video camera provides continuous high resolution imaging of the pool surface from a low angle position within 20 cm of the liquid-vapor interface. From the vantage point, the e-beam footprint is clearly defined and melt pool free surface shape can be observed. Effects of changes in a beam footprint, power distribution, and sweep frequency on pool surface shape and stability of vaporization are immediately shown. Other events observed and recorded include: formation of the pool and dissipation of ``rafts`` on the pool surface during startup, behavior of feed material as it enters the pool, effects of feed configuration changes on mixing of feed entering the pool volume and behaviors of co-evaporated materials of different vapor pressures at the feed/pool boundary. When used in conjunction with laser vapor monitoring, correlation between pool surface phenomena and vaporizer performance has been identified. This video capability was used in verifying the titanium evaporation model results presented at this conference by confirming the calculated melt pool surface deformations caused by vapor pressure of the departing evaporant at the liquid-vapor interface.

  8. Evaluation of interfacial mechanical properties under shear loading in EB-PVD TBCs by the pushout method

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Sang-Seok [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan); Liu Yufu [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan); Kagawa, Yutaka [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan)]. E-mail: kagawa@iis.u-tokyo.ac.jp

    2007-06-15

    A new simple pushout technique for evaluation of interfacial shear mechanical properties in thermal barrier coatings has been developed. The technique is similar to the pushout test of fiber-reinforced ceramics, except for the specimen shape and support method. The technique has been applied to evaluation of interfacial delamination toughness, {gamma} {sub i}, of the electron beam physical vapor deposition (EB-PVD) ZrO{sub 2} thermal barrier coating (TBC) system. The change of {gamma} {sub i} in the EB-PVD system with thermal exposure is measured and discussed in terms of microstructural change and delamination crack path. The measured delamination toughness varied from {gamma} {sub i} = 10 to 115 J/m{sup 2}. The delamination path and TGO growth were found to be closely related. The delamination toughness significantly decreases due to the formation and growth of a spinel phase in the TGO layer. The relation between delamination toughness and delamination behavior is discussed.

  9. Improved rate control for electron-beam evaporation and evaluation of optical performance improvements.

    Science.gov (United States)

    Gevelber, Michael; Xu, Bing; Smith, Douglas

    2006-03-01

    A new deposition-rate-control and electron-beam-gun (e-gun) strategy was developed that significantly reduces the growth-rate variations for e-beam-deposited SiO2 coatings. The resulting improvements in optical performance are evaluated for multilayer bandpass filters. The adverse effect of uneven silica-source depletion on coating spectral performances during long deposition runs is discussed.

  10. Characterization of ITO/CdO/glass thin films evaporated by electron beam technique

    Directory of Open Access Journals (Sweden)

    Hussein Abdel-Hafez Mohamed and Hazem Mahmoud Ali

    2008-01-01

    Full Text Available A thin buffer layer of cadmium oxide (CdO was used to enhance the optical and electrical properties of indium tin oxide (ITO films prepared by an electron-beam evaporation technique. The effects of the thickness and heat treatment of the CdO layer on the structural, optical and electrical properties of ITO films were carried out. It was found that the CdO layer with a thickness of 25 nm results in an optimum transmittance of 70% in the visible region and an optimum resistivity of 5.1×10−3 Ω cm at room temperature. The effect of heat treatment on the CdO buffer layer with a thickness of 25 nm was considered to improve the optoelectronic properties of the formed ITO films. With increasing annealing temperature, the crystallinity of ITO films seemed to improve, enhancing some physical properties, such as film transmittance and conductivity. ITO films deposited onto a CdO buffer layer heated at 450 °C showed a maximum transmittance of 91% in the visible and near-infrared regions of the spectrum associated with the highest optical energy gap of 3.61 eV and electrical resistivity of 4.45×10−4 Ω cm at room temperature. Other optical parameters, such as refractive index, extinction coefficient, dielectric constant, dispersion energy, single effective oscillator energy, packing density and free carrier concentration, were also studied.

  11. Evidence of room temperature ferromagnetism in argon/oxygen annealed TiO2 thin films deposited by electron beam evaporation technique

    International Nuclear Information System (INIS)

    Mohanty, P.; Kabiraj, D.; Mandal, R.K.; Kulriya, P.K.; Sinha, A.S.K.; Rath, Chandana

    2014-01-01

    TiO 2 thin films deposited by electron beam evaporation technique annealed in either O 2 or Ar atmosphere showed ferromagnetism at room temperature. The pristine amorphous film demonstrates anatase phase after annealing under Ar/O 2 atmosphere. While the pristine film shows a super-paramagnetic behavior, both O 2 and Ar annealed films display hysteresis at 300 K. X-ray photo emission spectroscopy (XPS), Raman spectroscopy, Rutherford’s backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS) were used to refute the possible role of impurities/contaminants in magnetic properties of the films. The saturation magnetization of the O 2 annealed film is found to be higher than the Ar annealed one. It is revealed from shifting of O 1s and Ti 2p core level spectra as well as from the enhancement of high binding energy component of O 1s spectra that the higher magnetic moment is associated with higher oxygen vacancies. In addition, O 2 annealed film demonstrates better crystallinity, uniform deposition and smoother surface than that of the Ar annealed one from glancing angle X-ray diffraction (GAXRD) and atomic force microscopy (AFM). We conclude that although ferromagnetism is due to oxygen vacancies, the higher magnetization in O 2 annealed film could be due to crystallinity, which has been observed earlier in Co doped TiO 2 film deposited by pulsed laser deposition (Mohanty et al., 2012 [10]). - Highlights: • TiO 2 films were deposited by e-beam evaporation technique and post annealed under O 2 /Ar at 500 °C. • The pristine film shows SPM behavior where as O 2 and Ar annealed films demonstrate RTFM. • The presence of magnetic impurities has been discarded by various characterization techniques. • The magnetic moment is found to be higher in O 2 annealed film than the Ar annealed one. • The higher M s in O 2 annealed film is attributed to oxygen vacancies as well as crystallinity

  12. PVD following plasmin but not hyaluronidase: implications for combination pharmacologic vitreolysis therapy.

    Science.gov (United States)

    Wang, Zhi-Liang; Zhang, Xi; Xu, Xun; Sun, Xiao-Dong; Wang, Fang

    2005-01-01

    To study whether intravitreal injection of plasmin + hyaluronidase safely induces posterior vitreous detachment (PVD). Rabbits were randomized into three groups: (A) 20 rabbits, intravitreal injection of plasmin 1 U + hyaluronidase 20 U in balanced salt solution (BSS) 0.1 mL into one eye; (B) 12 rabbits, plasmin alone; (C) 12 rabbits, hyaluronidase alone. The fellow eye of each rabbit was injected BSS 0.1 mL. In Group A, scanning electron microscopy (SEM) was done in four rabbits at 0.5 hour and in four rabbits at 1 hour. After 7 days, all the remaining 36 rabbits received electroretinography, SEM was examined in eight of each group, and immunohistochemistry was done in four of each group. SEM disclosed the eyes of Group A had complete PVD (8/8), Group B partial PVD (7/8), and Group C (8/8) and all the control eyes (24/24) no PVD after 7 days. Partial PVD was found in 4/4 at 0.5 hour and complete PVD was seen in 3/4 at 1 hour in Group A. Immunohistochemistry showed that the amounts of laminin and fibronectin in the vitreoretinal interface were decreased in Group A and B versus the control eyes (P 0.05). Electroretinography showed no changes in any group (P >0.05). Vitreous injection of plasmin + hyaluronidase induced complete PVD with no obvious toxicity. Plasmin induced partial PVD, but hyaluronidase had no effects.

  13. High speed PVD thermal barrier coatings

    Energy Technology Data Exchange (ETDEWEB)

    Beele, W. [Sulzer Metco Coatings BV (Netherlands); Eschendorff, G. [Sulzer Metco Coatings BV (Netherlands); Eldim BV (Netherlands)

    2006-07-15

    The high speed PVD process (HS-PVD) combines gas phase coating synthesis with high deposition rates. The process has been demonstrated for high purity YSZ deposited as a chemically bonded top thermal barrier with columnar structure of EB-PVD features. The process can manufacture EB-PVD like coatings that match in regards to their TGO-formation and columnar structure. Coatings with a columnar structure formed by individual columns of 1/4 of the diameter of a classical EB-PVD type TBC have been deposited. These coatings have the potential to prove a significant reduction in thermal conductivity and in erosion performance. (Abstract Copyright [2006], Wiley Periodicals, Inc.)

  14. High speed PVD thermal barrier coatings

    International Nuclear Information System (INIS)

    Beele, W.; Eschendorff, G.

    2006-01-01

    The high speed PVD process (HS-PVD) combines gas phase coating synthesis with high deposition rates. The process has been demonstrated for high purity YSZ deposited as a chemically bonded top thermal barrier with columnar structure of EB-PVD features. The process can manufacture EB-PVD like coatings that match in regards to their TGO-formation and columnar structure. Coatings with a columnar structure formed by individual columns of 1/4 of the diameter of a classical EB-PVD type TBC have been deposited. These coatings have the potential to prove a significant reduction in thermal conductivity and in erosion performance. (Abstract Copyright [2006], Wiley Periodicals, Inc.)

  15. The properties of B-Sb thin films prepared by molecular flow region PVD process

    International Nuclear Information System (INIS)

    Kumashiro, Y.; Nakamura, K.; Sato, K.; Ohtsuka, M.; Ohishi, Y.; Nakano, M.; Doi, Y.

    2004-01-01

    The present paper is the first description on the electrical and thermoelectric properties of amorphous PVD B 12 Sb 2 films prepared using the reaction of decaborane gas with evaporated antimony gas on Si (1900 A) / SiO x (3700 A) / Si (100) (625 μm) substrate at the temperature 350 deg. C. Ohmic metals contacts of the film were examined by making evaporated Al, followed by annealing at 200 deg. C. The comparatively high mobility of ∼100 cm 2 /V s and high thermoelectric figures-of-merit of ∼10 -4 /K were confirmed

  16. CuIn{sub x}Ga{sub 1-x}Se{sub 2} thin films prepared by electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Venkatachalam, M.; Kannan, M.D.; Jayakumar, S.; Balasundaraprabhu, R.; Nandakumar, A.K. [Thin Film Center, Department of Physics, PSG College of Technology (India); Muthukumarasamy, N. [Department of Physics, Coimbatore Institute of Technology (India)

    2008-05-15

    CuIn{sub x}Ga{sub 1-x}Se{sub 2} bulk compound of three different compositions x=0.75, 0.80 and 0.85 have been prepared using individual elements of copper, indium, gallium and selenium. Thin films of CuIn{sub x}Ga{sub 1-x}Se{sub 2} have been deposited using the prepared bulk by electron beam evaporation method. The structural studies carried on the deposited films revealed that films annealed at 400 C are crystalline in nature exhibiting chalcopyrite phase. The position of the (1 1 2) peak in the X-ray diffractogram corresponding to the chalcopyrite phase has been found to be dependent on the percentage of gallium in the films. The composition of the prepared bulk and thin films has been identified using energy dispersive X-ray analysis. The photoluminescence spectra of the CuIn{sub x}Ga{sub 1-x}Se{sub 2} films exhibited sharp luminescence peaks corresponding to the band gap of the material. (author)

  17. Advanced neutron and X-ray techniques for insights into the microstructure of EB-PVD thermal barrier coatings

    Energy Technology Data Exchange (ETDEWEB)

    Kulkarni, Anand [State University of New York, Stony Brook, NY 11794 (United States); Goland, Allen [State University of New York, Stony Brook, NY 11794 (United States); Herman, Herbert [State University of New York, Stony Brook, NY 11794 (United States)]. E-mail: hherman@ms.cc.sunysb.edu; Allen, Andrew J. [National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States); Dobbins, Tabbetha [National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States); DeCarlo, Francesco [Argonne National Laboratory, Argonne, IL 60439 (United States); Ilavsky, Jan [Argonne National Laboratory, Argonne, IL 60439 (United States); Long, Gabrielle G. [Argonne National Laboratory, Argonne, IL 60439 (United States); Fang, Stacy [Chromalloy Gas Turbine Corporation, Orangeburg, NY 10962 (United States); Lawton, Paul [Chromalloy Gas Turbine Corporation, Orangeburg, NY 10962 (United States)

    2006-06-25

    The ongoing quest to increase gas turbine efficiency and performance (increased thrust) provides a driving force for materials development. While improved engine design and usage of novel materials provide solutions for increased engine operating temperatures, and hence fuel efficiency, reliability issues remain. Thermal barrier coatings (TBCs), deposited onto turbine components using the electron-beam physical vapor deposition (EB-PVD) process, exhibit unique pore architectures capable of bridging the technological gap between insulation/life extension and prime reliance. This article explores the potential of advanced X-ray and neutron techniques for comprehension of an EB-PVD TBC coating microstructure. While conventional microscopy reveals a hierarchy of voids, complementary advanced techniques allow quantification of these voids in terms of component porosities, anisotropy, size and gradient through the coating thickness. In addition, the derived microstructural parameters obtained both further knowledge of the nature and architecture of the porosity, and help establish its influence on the resultant thermal and mechanical properties.

  18. From field evaporation to focused ion beams

    International Nuclear Information System (INIS)

    Forbes, R.G.

    2004-01-01

    Full text: This paper report various items of recent progress in the theory of field evaporation and the theory of the liquid-metal ion source. The research has, in part, been driven by a desire to find out how to reduce the beam-spot size in a focused ion beam machine, which is developing as a significant tool of nanotechnology. A major factor in determining beam spot size seems to be the behavior of the liquid-metal ion source (LMIS), and one route might be to reduce the minimum emission current of a LMIS, if this is possible. Theories of LMIS minimum emission current have been re-examined. Some progress has been made, but development of more accurate theory has been constrained by several factors, include the long-known limitations of the present theory of field evaporation (FEV). This, in turn, has stimulated a wider re-examination of FEV theory. As part of some general theoretical remarks, the following items of recent progress will be covered. Various results concerning the prediction of the field F e at which the activation energy Q for field evaporation is zero, including calculations in which vacuum electrostatic energy changes are taken into account, and another look at the views of Kingham and Tsong concerning escape charge-state. Some years ago, the following approximate formula was derived for the dependence of FEV activation energy on field F: Q=B(F e /F - 1) 2 . It has recently been possible to show that the parameter B can be estimated as B= βYΩ/8, where Y is Young's modulus, Ω is the atomic volume, and β is a correction factor of order. In the framework of the charge-draining mechanism, another look at how the activation-energy hump can be modelled, in order to predict/explain the conditions under which FEV becomes dominated by ion tunnelling rather than field evaporation. A review of the changes in LMIS theory that result from applying the equation of continuity to the metal/vacuum interface, including modifications to the theory of minimum

  19. SiO2 Antireflection Coatings Fabricated by Electron-Beam Evaporation for Black Monocrystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Minghua Li

    2014-01-01

    Full Text Available In this work we prepared double-layer antireflection coatings (DARC by using the SiO2/SiNx:H heterostructure design. SiO2 thin films were deposited by electron-beam evaporation on the conventional solar cell with SiNx:H single-layer antireflection coatings (SARC, while to avoid the coverage of SiO2 on the front side busbars, a steel mask was utilized as the shelter. The thickness of the SiNx:H as bottom layer was fixed at 80 nm, and the varied thicknesses of the SiO2 as top layer were 105 nm and 122 nm. The results show that the SiO2/SiNx:H DARC have a much lower reflectance and higher external quantum efficiency (EQE in short wavelengths compared with the SiNx:H SARC. A higher energy conversion efficiency of 17.80% was obtained for solar cells with SiO2 (105 nm/SiNx:H (80 nm DARC, an absolute conversion efficiency increase of 0.32% compared with the conventional single SiNx:H-coated cells.

  20. Floating convection barrier for evaporation source

    International Nuclear Information System (INIS)

    1975-01-01

    A floating matrix of titanium in an uranium evaporation source, melted by an electron beam, serves as a barrier for preventing cooler material from reaching the evaporation area. This construction allows a big volume of melted uranium to be present and new uranium to be furnished in regulated intervals without manual intervention

  1. Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Rubing, E-mail: zrb86411680@126.com [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China); Zhang, Deming [Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China); Chen, Guiqing [Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China); Wang, Yuesheng [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China)

    2014-07-01

    TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.

  2. Thermal barrier coatings of rare earth materials deposited by electron beam-physical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Xu Zhenhua [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Graduate School of Chinese Academy of Sciences, Beijing 100039 (China); Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); He Limin, E-mail: he_limin@yahoo.co [Beijing Institute of Aeronautical Materials, Department 5, P.O. Box 81-5, Beijing 100095 (China); Chen Xiaolong; Zhao Yu [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Graduate School of Chinese Academy of Sciences, Beijing 100039 (China); Cao Xueqiang, E-mail: xcao@ciac.jl.c [State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China)

    2010-10-15

    Thermal barrier coatings (TBCs) have very important applications in gas turbines for higher thermal efficiency and protection of components at high temperature. TBCs of rare earth materials such as lanthanum zirconate (La{sub 2}Zr{sub 2}O{sub 7}, LZ), lanthanum cerate (La{sub 2}Ce{sub 2}O{sub 7}, LC), lanthanum cerium zirconate (La{sub 2}(Zr{sub 0.7}Ce{sub 0.3}){sub 2}O{sub 7}, LZ7C3) were prepared by electron beam-physical vapor deposition (EB-PVD). The composition, crystal structure, cross-sectional morphology and cyclic oxidation behavior of these coatings were studied. These coatings have partially deviated from their original compositions due to the different evaporation rates of oxides, and the deviation could be reduced by properly controlling the deposition condition. A double ceramic layer-thermal barrier coatings (DCL-TBCs) of LZ7C3 and LC could also be deposited with a single LZ7C3 ingot by properly controlling the deposition energy. LaAlO{sub 3} is formed due to the chemical reaction between LC and Al{sub 2}O{sub 3} in the thermally grown oxide (TGO) layer. The failure of DCL-TBCs is a result of the sintering-induced of LZ7C3 coating and the chemical incompatibility of LC and TGO. Since no single material that has been studied so far satisfies all the requirements for high temperature applications, DCL-TBCs are an important development direction of TBCs.

  3. Simulated performance of the in-beam conversion-electron spectrometer, SPICE

    Energy Technology Data Exchange (ETDEWEB)

    Ketelhut, S., E-mail: ketelhut@triumf.ca [TRIUMF, 4004 Wesbrook Mall, Vancouver, British Columbia, Canada V6T 2A3 (Canada); Evitts, L.J.; Garnsworthy, A.B.; Bolton, C.; Ball, G.C.; Churchman, R. [TRIUMF, 4004 Wesbrook Mall, Vancouver, British Columbia, Canada V6T 2A3 (Canada); Dunlop, R. [Department of Physics, University of Guelph, Guelph, Ontario, Canada N1G 2W1 (Canada); Hackman, G.; Henderson, R.; Moukaddam, M. [TRIUMF, 4004 Wesbrook Mall, Vancouver, British Columbia, Canada V6T 2A3 (Canada); Rand, E.T.; Svensson, C.E. [Department of Physics, University of Guelph, Guelph, Ontario, Canada N1G 2W1 (Canada); Witmer, J. [TRIUMF, 4004 Wesbrook Mall, Vancouver, British Columbia, Canada V6T 2A3 (Canada)

    2014-07-01

    The SPICE spectrometer is a new in-beam electron spectrometer designed to operate in conjunction with the TIGRESS HPGe Clover array at TRIUMF-ISAC. The spectrometer consists of a large area, annular, segmented lithium-drifted silicon electron detector shielded from the target by a photon shield. A permanent magnetic lens directs electrons around the photon shield to the detector. Experiments will be performed utilising Coulomb excitation, inelastic-scattering, transfer and fusion–evaporation reactions using stable and radioactive ion beams with suitable heavy-ion detection. Good detection efficiency can be achieved in a large energy range up to 3500 keV electron energy using several magnetic lens designs which are quickly interchangeable. COMSOL and Geant4 simulations have been used to maximise the detection efficiency. In addition, the simulations have guided the design of components to minimise the contributions from various sources of backgrounds.

  4. Study of electron-beam-evaporated MgO films using electron diffraction, optical absorption and cathodoluminescence

    Energy Technology Data Exchange (ETDEWEB)

    Aboelfotoh, M.O.; Ramsey, J.N.

    1982-05-21

    Reflection high energy electron diffraction, optical absorption and cathodoluminescence were used to study MgO films deposited onto fused silica, single-crystal silicon and LiF substrates at various temperatures. Results showed that some of the same optical absorption and emission bands observed in X- or UV-irradiated, additively colored or mechanically deformed MgO crystals were observed in evaporated MgO films. The peak positions and the relative peak intensities of the optical absorption and emission bands depended on the substrate temperature during film deposition as well as on the structure of the film. The effect of heating the films in air and vacuum on the optical absorption and emission bands is also discussed.

  5. Stress analysis and microstructure of PVD monolayer TiN and multilayer TiN/(Ti,Al)N coatings

    NARCIS (Netherlands)

    Carvalho, NJM; Zoestbergen, E; Kooi, BJ; De Hosson, JTM

    2003-01-01

    Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of TiN and (Ti,Al)N layers were evaluated with respect to their stress state and microstructure. The TiN was deposited by triode evaporation ion plating, whereas the TiN/(Ti,AI)N was deposited using a

  6. Evaporator line for special electron tubes, in particular electron multipliers

    International Nuclear Information System (INIS)

    Richter, M.

    1984-01-01

    The invention has been aimed at reducing the effort for preventing short circuits in achieving certain material-dependent effects e.g. secondary emission, by deposition through evaporation in the production of electron tubes, in particular electron multipliers

  7. Impact of high temperature and short period annealing on SnS films deposited by E-beam evaporation

    International Nuclear Information System (INIS)

    Gedi, Sreedevi; Reddy, Vasudeva Reddy Minnam; Kang, Jeong-yoon; Jeon, Chan-Wook

    2017-01-01

    Highlights: • Preparation SnS films using electron beam evaporation at room temperature. • SnS films were annealed at a high temperaure for different short period of times. • The films showed highly oriented (111) planes with orthorhombic crystal structure. • Surface morphology showed bigger and faceted grains embedded in orthorombic. • The TEM confirmed that big orthorombic slabs had single-crystalline nature. - Abstract: Thin films of SnS were deposited on Mo-substrate using electron beam evaporation at room temperature. As-deposited SnS films were annealed at a constant high temperaure of 860 K for different short period of times, 1 min, 3 min, and 5 min. The impact of heat treatment period on the physical properties of SnS films was investigated using appropriate characterization tools. XRD analysis revealed that the films were highly oriented along (111) plane with orthorhombic crystal structure. Surface morphology of as-deposited SnS films showed an identical leaf texture where as the annealed films showed large orthorombic slab shape grains in adidition to the leaf shape grains, which indicates the significance of short period annealing at high temperature. The transmission electron microscopy confirmed that those large orthorombic slabs had single-crystalline nature. The results emphasized that the short period annealing treatment at high temperature stimulated the growth of film towards the single crystallinity.

  8. Impact of high temperature and short period annealing on SnS films deposited by E-beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Gedi, Sreedevi; Reddy, Vasudeva Reddy Minnam; Kang, Jeong-yoon; Jeon, Chan-Wook, E-mail: cwjeon@ynu.ac.kr

    2017-04-30

    Highlights: • Preparation SnS films using electron beam evaporation at room temperature. • SnS films were annealed at a high temperaure for different short period of times. • The films showed highly oriented (111) planes with orthorhombic crystal structure. • Surface morphology showed bigger and faceted grains embedded in orthorombic. • The TEM confirmed that big orthorombic slabs had single-crystalline nature. - Abstract: Thin films of SnS were deposited on Mo-substrate using electron beam evaporation at room temperature. As-deposited SnS films were annealed at a constant high temperaure of 860 K for different short period of times, 1 min, 3 min, and 5 min. The impact of heat treatment period on the physical properties of SnS films was investigated using appropriate characterization tools. XRD analysis revealed that the films were highly oriented along (111) plane with orthorhombic crystal structure. Surface morphology of as-deposited SnS films showed an identical leaf texture where as the annealed films showed large orthorombic slab shape grains in adidition to the leaf shape grains, which indicates the significance of short period annealing at high temperature. The transmission electron microscopy confirmed that those large orthorombic slabs had single-crystalline nature. The results emphasized that the short period annealing treatment at high temperature stimulated the growth of film towards the single crystallinity.

  9. Experiments on high power EB evaporation of niobium

    International Nuclear Information System (INIS)

    Kandaswamy, E.; Bhardwaj, R.L.; Ram Gopal; Ray, A.K.; Kulgod, S.V.

    2002-01-01

    Full text: The versatility of electron beam evaporation makes the deposition of many new and unusual materials possible. This technique offers freedom from contamination and precise control. High power electron guns are especially used for obtaining high evaporation rates for large area coatings. This paper deals with the coating experiments carried out on an indigenously developed high power strip electron gun with niobium as evaporant at 40 kW on S.S. substrate. The practical problems of conditioning the gun and venting the vacuum system after the high power operation are also discussed. The coating rate was calculated by weight difference method

  10. Iron-regulated transcription of the pvdA gene in Pseudomonas aeruginosa: effect of Fur and PvdS on promoter activity.

    OpenAIRE

    Leoni, L; Ciervo, A; Orsi, N; Visca, P

    1996-01-01

    The pvdA gene, encoding the enzyme L-ornithine N5-oxygenase, catalyzes a key step of the pyoverdin biosynthetic pathway in Pseudomonas aeruginosa. Expression studies with a promoter probe vector made it possible to identify three tightly iron-regulated promoter regions in the 5.9-kb DNA fragment upstream of pvdA. The promoter governing pvdA expression was located within the 154-bp sequence upstream of the pvdA translation start site. RNA analysis showed that expression of PvdA is iron regulat...

  11. Electrical and optical transport characterizations of electron beam evaporated V doped In{sub 2}O{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Islam, Md. Ariful, E-mail: arifapee19@gmail.com [Department of Physics, Rajshahi University of Engineering & Technology (RUET), Rajshahi (Bangladesh); Roy, Ratan Chandra; Hossain, Jaker; Julkarnain, Md.; Khan, Khairul Alam [Department of Applied Physics & Electronic Engineering, University of Rajshahi (Bangladesh)

    2017-01-15

    Vanadium (5 at. %) doped Indium Oxide (V: In{sub 2}O{sub 3}) thin films with different thicknesses (50 nm, 100 nm and 150 nm) were prepared onto glass substrate by electron beam evaporation technique in a vacuum of about 4 x 10{sup -3} Pa. X-ray diffraction (XRD) pattern revealed that the prepared films of thickness 50 nm are amorphous in nature. Temperature dependence of electrical resistivity was studied in the 300 < T < 475 K temperature range. The films exhibit a metallic behavior in the 300 < T < 380 K range with a positive temperature coefficient of the resistivity (TCR), whereas at T > 380 K, the conduction behavior turns into a semiconductor with a negative TCR. Optical studies revealed that the films of thickness 50 nm possess high transmittance of about 86 % in the near-infrared spectral region. The direct optical band gap lies between 3.26 and 3.00 eV depending on the film thickness. (author)

  12. A study of the nanostructure and hardness of electron beam evaporated TiAlBN Coatings

    Energy Technology Data Exchange (ETDEWEB)

    Baker, M.A., E-mail: m.baker@surrey.ac.u [The Surface Analysis Laboratory, Faculty of Engineering and Physical Sciences, University of Surrey, Guildford GU2 7XH (United Kingdom); Monclus, M.A. [National Physical Laboratory, Hampton Road, Teddington, TW11 0LW (United Kingdom); Rebholz, C. [Department of Mechanical and Manufacturing Engineering, University of Cyprus, 1678 Nicosia (Cyprus); Gibson, P.N. [Institute for Health and Consumer Protection, Joint Research Centre, I-21027 Ispra (Italy); Leyland, A.; Matthews, A. [Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD (United Kingdom)

    2010-05-31

    TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material source onto AISI 316 stainless steel substrates at a temperature of 450 {sup o}C and substrate bias of - 100 V. The stoichiometry and nanostructure have been studied by X-ray photoelectron spectroscopy, X-ray diffraction and transmission electron microscopy. The hardness and elastic modulus were determined by nanoindentation. Five coatings have been deposited, three from hot-pressed TiAlBN material and two from hot isostatically pressed (HIPped) material. The coatings deposited from the hot-pressed material exhibited a nanocomposite nc-(Ti,Al)N/a-BN/a-(Ti,Al)B{sub 2} structure, the relative phase fraction being consistent with that predicted by the equilibrium Ti-B-N phase diagram. Nanoindentation hardness values were in the range of 22 to 32 GPa. Using the HIPped material, coating (Ti,Al)B{sub 0.29}N{sub 0.46} was found to have a phase composition of 72-79 mol.% nc-(Ti,Al)(N,B){sub 1-x}+ 21-28 mol.% amorphous titanium boride and a hardness of 32 GPa. The second coating, (Ti,Al)B{sub 0.66}N{sub 0.25}, was X-ray amorphous with a nitride+boride multiphase composition and a hardness of 26 GPa. The nanostructure and structure-property relationships of all coatings are discussed in detail. Comparisons are made between the single-EB coatings deposited in this work and previously deposited twin-EB coatings. Twin-EB deposition gives rise to lower adatom mobilities, leading to (111) (Ti,Al)N preferential orientation, smaller grain sizes, less dense coatings and lower hardnesses.

  13. Thermal cycling behaviour of lanthanum zirconate as EB-PVD thermal barrier coating

    International Nuclear Information System (INIS)

    Bobzin, K.; Lugscheider, E.; Bagcivan, N.

    2006-01-01

    Thermal cycling tests with two different EB-PVD thermal barrier coatings (TBC) were performed in a furnace cycle test. The results of these tests showed an increase of endurable cycle number when pyrochloric La 2 Zr 2 O 7 was used as TBC. 1865 cycles were reached with La 2 Zr 2 O 7 and 1380 cycles with 7 weigth-% yttria stabilised zirconia (YSZ) EB-PVD TBC. Additional investigation was made with scanning electron microscope (SEM) to investigate morphology and to determine chemical composition by electron dispersive x-ray spectroscopy (EDS) analysis. X-Ray diffraction was performed to analyze structural constitution of deposited coatings. (Abstract Copyright [2006], Wiley Periodicals, Inc.)

  14. Preparation of targets using electron gun systems

    International Nuclear Information System (INIS)

    Maier-Komor, P.

    1975-01-01

    Most targets of isotopes with very low vapor pressure can only be fabricated by vacuum deposition using an electron gun system or a heavy ion sputtering system. Heavy ion sputtering is a very new technique with many unsolved problems. Therefore it seems to be easier to work with an electron gun. Different commercially available electron guns, which are all designed for the high evaporation rates used in industry, are examined for their qualification in processing small amounts of material as used in fabrication of isotope targets. Electron backscattering and the associated efficiency of the electron beam power is strongly dependent on the atomic number Z of the evaporant and the incident angle of the electron beam on the surface of the evaporant. This dependence leads also to the undesired effects to the target layers from electrons and ions. Some precautions are necessary against the effects of the electrons and ions, which are formed in the plasma directly over the beam impact point. Beam power and beam density have to be chosen to get a constant evaporation rate and a low enough condensation rate in order not to overheat the target substrates. To evaporate some metals it may be helpful to pulse the electron beam

  15. Electron Beam Diagnostics in Plasmas Based on Electron Beam Ionization

    Science.gov (United States)

    Leonhardt, Darrin; Leal-Quiros, Edbertho; Blackwell, David; Walton, Scott; Murphy, Donald; Fernsler, Richard; Meger, Robert

    2001-10-01

    Over the last few years, electron beam ionization has been shown to be a viable generator of high density plasmas with numerous applications in materials modification. To better understand these plasmas, we have fielded electron beam diagnostics to more clearly understand the propagation of the beam as it travels through the background gas and creates the plasma. These diagnostics vary greatly in sophistication, ranging from differentially pumped systems with energy selective elements to metal 'hockey pucks' covered with thin layers of insulation to electrically isolate the detector from the plasma but pass high energy beam electrons. Most importantly, absolute measurements of spatially resolved beam current densities are measured in a variety of pulsed and continuous beam sources. The energy distribution of the beam current(s) will be further discussed, through experiments incorporating various energy resolving elements such as simple grids and more sophisticated cylindrical lens geometries. The results are compared with other experiments of high energy electron beams through gases and appropriate disparities and caveats will be discussed. Finally, plasma parameters are correlated to the measured beam parameters for a more global picture of electron beam produced plasmas.

  16. Microstructural investigations of interfaces in PVD TiN coated tool steels

    NARCIS (Netherlands)

    Carvalho, NJM; in't Veld, AJH; De Hosson, JTM; Lejcek, P; Paidar,

    1999-01-01

    The microstructure of PVD TiN coated tools steels composites has been investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). It was found that the microstructure of the coatings consists of a dense fibrous structure typical of a zone T structure. When the

  17. Characterization of electron beam evaporated carbon films and compound formation on titanium and silicon

    International Nuclear Information System (INIS)

    Luthin, J.; Linsmeier, C.

    2001-01-01

    The formation of carbon-based mixed materials is unavoidable on the plasma-facing components (e.g. first wall and divertor) of fusion devices when carbon is used together with other materials. On the surfaces of these components very different conditions with respect to particle and energy impact occur. To predict the mixed material formation under these conditions the precise knowledge of the fundamental mechanisms governing these interactions is essential. In this paper we present the results of carbon interaction with titanium and silicon, as model substances for metallic and covalent carbides, during thermal treatment. To perform basic studies of the reactions of carbon with different elements, thin carbon films are produced by electron beam evaporation on the different substrates under UHV conditions. All measurements for chemical analysis are performed using X-ray photoelectron spectroscopy (XPS). We discuss first the properties of the deposited carbon films. The carbon films are characterized on inert gold surfaces and are compared to bulk graphite. Annealing of the carbon films up to 970 K leads to a transition from a disordered carbon network into a graphitic structure. Preparation of carbon films at room temperature on titanium or silicon leads to a limited carbide formation at the carbon/substrate interface. Carbon deposited in excess of several monolayers is present in elementary form. Annealing of the samples leads to complete carbidization consuming the available carbon in both cases. Titanium reacts to TiC and additional substoichiometric carbide, silicon forms SiC with exact stoichiometry. (orig.)

  18. Advanced electron beam techniques

    International Nuclear Information System (INIS)

    Hirotsu, Yoshihiko; Yoshida, Yoichi

    2007-01-01

    After 100 years from the time of discovery of electron, we now have many applications of electron beam in science and technology. In this report, we review two important applications of electron beam: electron microscopy and pulsed-electron beam. Advanced electron microscopy techniques to investigate atomic and electronic structures, and pulsed-electron beam for investigating time-resolved structural change are described. (author)

  19. Electron beam melting of sponge titanium

    International Nuclear Information System (INIS)

    Kanayama, Hiroshi; Kusamichi, Tatsuhiko; Muraoka, Tetsuhiro; Onouye, Toshio; Nishimura, Takashi

    1991-01-01

    Fundamental investigations were done on electron beam (EB) melting of sponge titanium by using 80 kW EB melting furnace. Results obtained are as follows: (1) To increase the melting yield of titanium in EB melting of sponge titanium, it is important to recover splashed metal by installation of water-cooled copper wall around the hearth and to decrease evaporation loss of titanium by keeping the surface temperature of molten metal just above the melting temperature of titanium without local heating. (2) Specific power consumption of drip melting of pressed sponge titanium bar and hearth melting of sponge titanium are approximately 0.9 kWh/kg-Ti and 0.5-0.7 kWh/kg-Ti, respectively. (3) Ratios of the heat conducted to water-cooled mould in the drip melting and to water-cooled hearth in the hearth melting to the electron beam input power are 50-65% and 60-65%, respectively. (4) Surface defects of EB-melted ingots include rap which occurs when the EB output is excessively great, and transverse cracks when the EB output is excessively small. To prevent surface defects, the up-down withdrawal method is effective. (author)

  20. Effect of deposition distance on thickness and microstructure of silicon thin film produced by electron beam evaporation; Efeito da distancia de deposicao na espessura e microestrutura de filme fino obtido por evaporacao por feixe de eletrons

    Energy Technology Data Exchange (ETDEWEB)

    Toledo, T.F.; Ramanery, F.P.; Branco, J.R.T. [Fundacao Centro Tecnologico de Minas Gerais, Belo Horizonte, MG (Brazil)], e-mail: thalitaqui@yahoo.com.br; Cunha, M.A. [Acos Especiais Itabira S.A. (Acesita), Belo Horizonte, MG (Brazil)

    2006-07-01

    The interest for materials with new characteristics and properties made thin films an area of highest research interest. Silicon thin films have been widely used in solar cells, being the main active layer. In this work, the effect of deposition distance on thickness and microstructure of silicon films was investigated. The electron beam evaporation technique with argon plasma assistance was used to obtain films on stainless steel 304, Fe-Si alloy and soda lime glass. The experiments were made varying electron beam current and deposition pressure. The results are discussed based on Hertz-Knudsen's law and thin films microstructure evolution models. The samples were characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction and profilometer. (author)

  1. Production of AlN films: ion nitriding versus PVD coating

    International Nuclear Information System (INIS)

    Figueroa, U.; Salas, O.; Oseguera, J.

    2004-01-01

    The properties of AlN render this material very attractive for optical, electronic, and tribological applications; thus, a great interest exists for the production of thin AlN films on a variety of substrates. Many methods have been developed for this purpose where two processes stand out: plasma-assisted nitriding (PAN) and PVD coating. In the present paper, we compare the processing advantages and disadvantages of both methods in terms of the characteristics of the layers formed. AlN production by ion nitriding is very sensitive to presputtering cleaning and working pressure. Layers several micrometers thick can be produced in a few hours, which are formed by a fine mixture of Al+AlN. The surface morphology of the layers is rather rough. On the other hand, formation of PVD AlN coatings by DC reactive magnetron sputtering is more readily performed and better controlled than in ion nitriding. PVD results in macroscopically smoother AlN films and with similar thickness than the ion nitrided layers but produced in shorter processing times. The morphology of the PVD AlN layers is columnar with a fairly flat surface. Mechanisms for the formation of both types of AlN layers are proposed. One of the main differences between the two processes that explain the different AlN layer morphologies is the energy of the particles that arrive at the substrate. Considering only the processing advantages and the morphology of the AlN layers formed, PVD performs better than PAN processing

  2. Electron beam instabilities in gyrotron beam tunnels

    International Nuclear Information System (INIS)

    Pedrozzi, M.; Alberti, S.; Hogge, J.P.; Tran, M.Q.; Tran, T.M.

    1997-10-01

    Electron beam instabilities occurring in a gyrotron electron beam can induce an energy spread which might significantly deteriorate the gyrotron efficiency. Three types of instabilities are considered to explain the important discrepancy found between the theoretical and experimental efficiency in the case of quasi-optical gyrotrons (QOG): the electron cyclotron maser instability, the Bernstein instability and the Langmuir instability. The low magnetic field gradient in drift tubes of QOG makes that the electron cyclotron maser instability can develop in the drift tube at very low electron beam currents. Experimental measurements show that with a proper choice of absorbing structures in the beam tunnel, this instability can be suppressed. At high beam currents, the electrostatic Bernstein instability can induce a significant energy spread at the entrance of the interaction region. The induced energy spread scales approximately linearly with the electron beam density and for QOG one observes that the beam density is significantly higher than the beam density of an equivalent cylindrical cavity gyrotron. (author) figs., tabs., refs

  3. Windowless Electron Beam Experimental Irradiation WEBExplr

    International Nuclear Information System (INIS)

    Heyse, J.

    2009-01-01

    The design of the MYRRHA/XT-ADS, the European eXperimental Accelerator Driven System for the demonstration of Transmutation, includes a high power windowless spallation target operating with liquid LBE (Lead-Bismuth Eutectic) that will be irradiated with a 600 MeV proton beam at currents of up to 2.5 mA. When considering such a high power windowless target design, a number of questions need to be addressed, such as the stability of the free surface flow and its ability to remove the power deposited by the proton beam by forced convection, the compatibility of a large hot LBE reservoir with the beam line vacuum and the outgassing of the LBE in the spallation target circuit. These issues have been studied during previous experiments supported by numerical simulations. Another crucial point in the development of the spallation target is the demonstration of the safe and stable operation of the free LBE surface during irradiation with a high power proton beam. As a first step in this program, the WEBExpIr (Windowless target Electron Beam Experimental Irradiation) experiment was set up. The purpose of the WEBExpIr experiment was to investigate the influence of LBE surface heating caused by a charged particle beam in a situation representative of the MYRRHA/XT-ADS. More in particular, we wanted to assess possible free surface distortion or shockwave effects in nominal conditions and during sudden beam on/off transient situations, as well as possible enhanced evaporation

  4. Electron beam welding

    International Nuclear Information System (INIS)

    Schwartz, M.M.

    1974-01-01

    Electron-beam equipment is considered along with fixed and mobile electron-beam guns, questions of weld environment, medium and nonvacuum welding, weld-joint designs, tooling, the economics of electron-beam job shops, aspects of safety, quality assurance, and repair. The application of the process in the case of individual materials is discussed, giving attention to aluminum, beryllium, copper, niobium, magnesium, molybdenum, tantalum, titanium, metal alloys, superalloys, and various types of steel. Mechanical-property test results are examined along with the areas of application of electron-beam welding

  5. Process-structure-property relationships of micron thick gadolinium oxide films deposited by reactive electron beam-physical vapor deposition (EB-PVD)

    Science.gov (United States)

    Grave, Daniel A.

    Gadolinium oxide (Gd2O3) is an attractive material for solid state neutron detection due to gadolinium's high thermal neutron capture cross section. Development of neutron detectors based on Gd2 O3 requires sufficiently thick films to ensure neutron absorption. In this dissertation work, the process-structure-property relationships of micron thick Gd2O3 films deposited by reactive electron-beam physical vapor deposition (EB-PVD) were studied. Through a systematic design of experiments, fundamental studies were conducted to determine the effects of processing conditions such as deposition temperature, oxygen flow rate, deposition rate, and substrate material on Gd2O3 film crystallographic phase, texture, morphology, grain size, density, and surface roughness. Films deposited at high rates (> 5 A/s) were examined via x-ray diffraction (XRD) and Raman spectroscopy. Quantitative phase volume calculations were performed via a Rietveld refinement technique. All films deposited at high rates were found to be fully monoclinic or mixed cubic/monoclinic phase. Generally, increased deposition temperature and increased oxygen flow resulted in increased cubic phase volume. As film thickness increased, monoclinic phase volume increased. Grazing incidence x-ray diffraction (GIXRD) depth profiling analysis showed that cubic phase was only present under large incidence angle (large penetration depth) measurements, and after a certain point, only monoclinic phase was grown. This was confirmed by transmission electron microscopy (TEM) analysis with selected area diffraction (SAD). Based on this information, a large compressive stress was hypothesized to cause the formation of the monoclinic phase and this hypothesis was confirmed by demonstrating the existence of a stress induced phase transition. An experiment was designed to introduce compressive stress into the Gd2O 3 films via ion beam assisted deposition (IBAD). This allowed for systematic increase in compressive stress while

  6. Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation.

    Science.gov (United States)

    El Mel, Abdel-Aziz; Stephant, Nicolas; Gautier, Romain

    2016-10-06

    In this communication, we report on the growth, direct writing and nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation using a scanning electron microscope. The nanoblocks are produced by placing a droplet of an ethylene glycol solution containing silver nitrate and polyvinylpyrrolidone diluted in ethanol directly on a hot substrate heated up to 150 °C. Upon complete evaporation of the droplet, nanospheres, nano- and micro-triangles and nanoblocks made of silver-containing polymers, form over the substrate surface. Considering the nanoblocks as a model system, we demonstrate that such nanostructures are extremely sensitive to the e-beam extracted from the source of a scanning electron microscope operating at low acceleration voltages (between 5 and 7 kV). This sensitivity allows us to efficiently create various nanopatterns (e.g. arrays of holes, oblique slits and nanotrenches) in the material under e-beam irradiation. In addition to the possibility of writing, the nanoblocks revealed a self-healing ability allowing them to recover a relatively smooth surface after etching. Thanks to these properties, such nanomaterials can be used as a support for data writing and erasing on the nanoscale under low energy electron beam irradiation.

  7. Multi-walled carbon nanotube structural instability with/without metal nanoparticles under electron beam irradiation

    Science.gov (United States)

    Khan, Imran; Huang, Shengli; Wu, Chenxu

    2017-12-01

    The structural transformation of multi-walled carbon nanotubes (MWCNT) under electron beam (e-beam) irradiation at room temperature is studied, with respect to a novel passivation effect due to gold nanoparticles (Au NPs). MWCNT structural evolution induced by energetic e-beam irradiation leads to faster shrinkage, as revealed via in situ transmission electron microscopy, while MWCNT surface modification with Au NPs (Au-MWCNT) slows down the shrinkage by impeding the structural evolution process for a prolonged time under the same irradiation conditions. The new relationship between MWCNT and Au-MWCNT shrinking radii and irradiation time illustrates that the MWCNT shrinkage rate is faster than either theoretical predictions or the same process in Au-MWCNTs. As compared with the outer surface energy (positive curvature), the inner surface energy (negative curvature) of the MWCNT contributes more to the athermal evaporation of tube wall atoms, leading to structural instability and shrinkage under e-beam irradiation. Conversely, Au NPs possess only outer surface energy (positive curvature) compared with the MWCNT. Their presence on MWCNT surfaces retards the dynamics of MWCNT structural evolution by slowing down the evaporation process of carbon atoms, thus restricting Au-MWCNT shrinkage. Au NP interaction and growth evolves athermally on MWCNT surfaces, exhibits increase in their size, and indicates the association of this mechanism with the coalescence induced by e-beam activated electronic excitations. Despite their growth, Au NPs show extreme structural stability, and remain crystalline under prolonged irradiation. It is proposed that the surface energy of MWCNTs and Au NPs, together with e-beam activated soft modes or lattice instability effects, predominantly govern all the above varieties of structural evolution.

  8. Comparison of effective relative dielectric permittivities obtained by three independent ways for CeO2-Sm2O3 films prepared by EB-PVD (+IBAD) techniques

    International Nuclear Information System (INIS)

    Kundracik, F.; Neilinger, P.; Hartmanova, M.; Nadazdy, V.; Mansilla, C.

    2011-01-01

    Ceria, as material with relatively high dielectric permittivity, ε r , and ability to form films on the Si substrate, is a candidate for the gate dielectrics in the MOS devices. Doping with suitable e.g. trivalent rare earth oxides and suitable treatment after deposition (preparation) can improve their properties, e.g. ionic conductivity, dielectric permittivity and mechanical hardness. In this work, the dielectric properties of CeO 2 + Sm 2 O 3 films prepared by electron beam physical vapour deposition (EB-PVD) and some of them simultaneously also by the Ar + ionic beam assisted deposition (IBAD) techniques are analysed. (authors)

  9. Morphology, optical and ionic conductivity studies of electron beam irradiated polymer electrolyte film

    Science.gov (United States)

    Devendrappa, H.; Yesappa, L.; Niranjana, M.; Ashokkumar, S. P.; Vijeth, H.; Ganesh, S.

    2018-04-01

    The effects of electron beam (EB) irradiation on morphology, optical properties and ionic conductivity of (PVdF-co-HFP: LiClO4=90:10, PHL10) electrolyte films. The FESEM image reveal increasing porous morphology with increasing EB dose confirms the polymer degradation as result more amorphousity. The optical absorbance was found to be increase with red shift in UV region and direct optical band gaps was found decreased upon EB dose from 3.70 eV to 2.65 eV. The ionic conductivity increases slowly in lower frequency, whereas rapidly increases at the high frequency and found about 8.28×10-4 S/cm at 120 kGy dose. The obtained results suggest that the physical properties of polymer electrolytes can be changed using EB irradiation as requirement.

  10. Beam electron microprobe

    CERN Document Server

    Stoller, D; Muterspaugh, M W; Pollock, R E

    1999-01-01

    A beam profile monitor based on the deflection of a probe electron beam by the electric field of a stored, electron-cooled proton beam is described and first results are presented. Electrons were transported parallel to the proton beam by a uniform longitudinal magnetic field. The probe beam may be slowly scanned across the stored beam to determine its intensity, position, and size. Alternatively, it may be scanned rapidly over a narrow range within the interior of the stored beam for continuous observation of the changing central density during cooling. Examples of a two dimensional charge density profile obtained from a raster scan and of a cooling alignment study illustrate the scope of measurements made possible by this device.

  11. Setup for fission and evaporation cross-section measurements in reactions induced by secondary beams

    International Nuclear Information System (INIS)

    Hassan, A.A.; Luk'yanov, S.M.; Kalpakchieva, R.; Skobelev, N.K.; Penionzhkevich, Yu.Eh.; Dlouhy, Z.; Radnev, S.; Poroshin, N.V.

    2002-01-01

    A setup for studying reactions induced by secondary radioactive beams has been constructed. It allows simultaneous measurement of α-particle and fission fragment energy spectra. By measuring the α-particles, identification of evaporation residues is achieved. A set of three targets can be used so as to ensure sufficient statistics. Two silicon detectors, located at 90 degrees to the secondary beam direction, face each target, thus covering 30% of the solid angle. This experimental setup is to be used to obtain excitation functions of fusion-fission reactions and of reactions leading to evaporation residue production

  12. Enhancement of the optical and electrical properties of ITO thin films deposited by electron beam evaporation technique

    Science.gov (United States)

    Ali, H. M.; Mohamed, H. A.; Mohamed, S. H.

    2005-08-01

    Indium tin oxide (ITO) is widely utilized in numerous industrial applications due to its unique combined properties of transparency to visible light and electrical conductivity. ITO films were deposited on glass substrates by an electron beam evaporation technique at room temperature from bulk samples, with different thicknesses. The film with 1500 Å thick was selected to perform annealing in the temperature range of 200 400 °C and annealing for varying times from 15 to 120 min at 400 °C. The X-ray diffraction of the films was analyzed in order to investigate its dependence on thickness, and annealing. Electrical and optical measurements were also carried out. Transmittance, optical energy gap, refractive index, carrier concentration, thermal emissivity and resistivity were investigated. It was found that the as-deposited films with different thicknesses were highly absorbing and have relatively poor electrical properties. The films become opaque with increasing the film thickness. After thermal annealing, the resistance decreases and a simultaneous variation in the optical transmission occurs. A transmittance value of 85.5% in the IR region and 82% in the visible region of the spectrum and a resistivity of 2.8 × 10-4 Ω Cm were obtained at annealing temperature of 400 °C for 120 min.

  13. Fabrication and characterization of Ni-YSZ anode functional coatings by electron beam physical vapor deposition

    International Nuclear Information System (INIS)

    Meng, B.; Sun, Y.; He, X.D.; Peng, J.H.

    2009-01-01

    Two kinds of NiO-YSZ (yttria-stabilized zirconia) coatings, respectively with uniform and gradient distributions of NiO content along the coating thickness direction, were prepared by electron beam physical vapor deposition (EB-PVD) via adjusting electron beam currents. Then uniform and graded Ni-YSZ coatings were obtained from corresponding NiO-YSZ coatings after a reduction treatment. For uniform Ni-YSZ coating, the composition and porosity distributions along the coating thickness were uniform. The specific surface area and total pore volume for this coating could reach up to 4.330 m 2 g -1 and 0.0346 cm 3 g -1 respectively. The area specific resistance (ASR) of this coating kept increasing with the rise in temperature and an ASR of 2.1 x 10 -5 Ω cm 2 was obtained at 600 o C. For graded Ni-YSZ coating, a gradient in Ni content and porosity was realized along the coating thickness. A high porosity of up to 33% was achieved in the part of the coating close to the substrate, while a low porosity of 10% was obtained in the part close to coating surface.

  14. Electron Beam Generation in Tevatron Electron Lenses

    International Nuclear Information System (INIS)

    Kamerdzhiev, V.; Kuznetsov, G.; Shiltsev, V.; Solyak, N.; Tiunov, M.

    2006-01-01

    New type of high perveance electron guns with convex cathode has been developed. Three guns described in this article are built to provide transverse electron current density distributions needed for Electron Lenses for beam-beam compensation in the Tevatron collider. The current distribution can be controlled either by the gun geometry or by voltage on a special control electrode located near cathode. We present the designs of the guns and report results of beam measurements on the test bench. Because of their high current density and low transverse temperature of electrons, electron guns of this type can be used in electron cooling and beam-beam compensation devices

  15. Electron beam generation in Tevatron electron lenses

    International Nuclear Information System (INIS)

    Kamerdzhiev, V.; Kuznetsov, G.; Shiltsev, V.; Solyak, N.; Tiunov, M.

    2006-01-01

    New type of high perveance electron guns with convex cathode has been developed. Three guns described in this article are built to provide transverse electron current density distributions needed for Electron Lenses for beam-beam compensation in the Tevatron collider. The current distribution can be controlled either by the gun geometry or by voltage on a special control electrode located near cathode. We present the designs of the guns and report results of beam measurements on the test bench. Because of their high current density and low transverse temperature of electrons, electron guns of this type can be used in electron cooling and beam-beam compensation devices

  16. Application of electron beam irradiation, (1). Development and application of electron beam processors

    International Nuclear Information System (INIS)

    Katsumura, Yosuke

    1994-01-01

    This paper deals with characteristics, equipment (principle and kinds), present conditions, and future issues in the application of electron beam irradiation. Characteristics of electron beams are described in terms of the following: chemical and biological effects of radiation; energy and penetrating power of electron beams; and principle and kinds of electron beam accelerator. Industrial application of electron beam irradiation has advantages of high speed procedure and producibility, less energy, avoidance of poisonous gas, and extreme reduction of organic solvents to be used. The present application of electron beam irradiation cen be divided into the following: (1) hardening of resin or coated membrane; (2) improvement of macromolecular materials; (3) environmental protection; (4) sterilization; (5) food sterilization. The present equipment for electron beam irradiation is introduced according to low energy, medium energy, and high energy equipment. Finally, future issues focuses on (1) the improvement of traceability system and development of electron dosimetric techniques and (2) food sterilization. (N.K.)

  17. Evaporation of Droplets in Plasma Spray-Physical Vapor Deposition Based on Energy Compensation Between Self-Cooling and Plasma Heat Transfer

    Science.gov (United States)

    Liu, Mei-Jun; Zhang, Meng; Zhang, Qiang; Yang, Guan-Jun; Li, Cheng-Xin; Li, Chang-Jiu

    2017-10-01

    In the plasma spray-physical vapor deposition process (PS-PVD), there is no obvious heating to the feedstock powders due to the free molecular flow condition of the open plasma jet. However, this is in contrast to recent experiments in which the molten droplets are transformed into vapor atoms in the open plasma jet. In this work, to better understand the heating process of feedstock powders in the open plasma jet of PS-PVD, an evaporation model of molten ZrO2 is established by examining the heat and mass transfer process of molten ZrO2. The results reveal that the heat flux in PS-PVD open plasma jet (about 106 W/m2) is smaller than that in the plasma torch nozzle (about 108 W/m2). However, the flying distance of molten ZrO2 in the open plasma jet is much longer than that in the plasma torch nozzle, so the heating in the open plasma jet cannot be ignored. The results of the evaporation model show that the molten ZrO2 can be partly evaporated by self-cooling, whereas the molten ZrO2 with a diameter <0.28 μm and an initial temperature of 3247 K can be completely evaporated within the axial distance of 450 mm by heat transfer.

  18. An electromagnetically focused electron beam line source

    International Nuclear Information System (INIS)

    Iqbal, Munawar; Masood, Khalid; Rafiq, Mohammad; Chaudhary, Maqbool A.; Aleem, Fazal-e-

    2003-01-01

    A directly heated thermionic electron beam source was constructed. A tungsten wire of length 140 mm with diameter 0.9 mm was used as a cathode. An emission current of 5000 mA was achieved at an input heating power of 600 W. Cathode to anode distance of 6 mm with acceleration voltage of 10 kV was used. A uniform external magnetic field of 50 G was employed to obtain a well-focused electron beam at a deflection of 180 deg., with cathode to work site distance of 130 mm. Dimensions of the beam (1.25x120 mm) recorded at the work site were found to be in good agreement with the designed length of cathode. The deformation of the cathode was overcome by introducing a spring action mechanism, which gives uniform emission current density throughout the emission surface. We have achieved the saturation limit of the designed source resulting in smooth and swift operation of the gun for many hours (10-15 h continuously). The design of gun is so simple that it can accommodate longer cathodes for obtaining higher emission values. This gun has made it possible to coat large substrate surfaces at much faster evaporation rate at lower cost. It can also be useful in large-scale vacuum metallurgy plants for melting, welding and heat treatment

  19. Design of 120 MW beam power electron gun for high power klystron

    International Nuclear Information System (INIS)

    Zhou Zusheng; Dong Dong

    2005-01-01

    An electron gun was designed and the beam optics for a China-made 50 MW klystron was simulated. The electron gun ceramic cylinder was designed and optimized. The China-made cathode was replaced with an imported one to lessen evaporation and arcing. The high voltage (320 kV) of the cathode was increased to meet the klystron output power demand and a low electric field strength (22.1 kV/mm) electron gun was designed to avoid the high power operation which damaged the ceramic cylinder. The klystron output power was increased and life span extended. (authors)

  20. Effect of a ductility layer on the tensile strength of TiAl-based multilayer composite sheets prepared by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Rubing, E-mail: zrb86411680@126.com [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China); Zhang, Yaoyao [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China); Liu, Qiang [Beijing Institute of Astronautical Systems Engineering, Beijing 100076 (China); Chen, Guiqing [Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China); Zhang, Deming [Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China)

    2014-09-15

    TiAl/Nb and TiAl/NiCoCrAl laminate composite sheets with a thickness of 0.4–0.6 mm and dimensions of 150 mm × 100 mm were successfully fabricated by electron beam physical vapor deposition. The microstructures of the sheets were examined, and their mechanical properties were compared with those of TiAl monolithic sheet produced by electron beam physical vapor deposition. Tensile testing was performed at room temperature and 750 °C, and the fracture surfaces were examined by scanning electron microscopy. Among the three microlaminate sheets, the TiAl/NiCoCrAl micro-laminate sheet had the best comprehensive properties at room temperature, and the TiAl/Nb micro-laminate sheet showed the ideal high-temperature strength and plasticity at 750 °C. The result was discussed in terms of metal strengthening mechanism. - Highlights: • TiAl-based multilayer foils was fabricated successfully by using EB-PVD method; • The tensile properties and micro-fracture morphologies of the sheet were investigated; • The deformation behavior of the multilayer foils was discussed.

  1. Definition of Beam Diameter for Electron Beam Welding

    Energy Technology Data Exchange (ETDEWEB)

    Burgardt, Paul [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Pierce, Stanley W. [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Dvornak, Matthew John [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2016-03-11

    It is useful to characterize the dimensions of the electron beam during process development for electron beam welding applications. Analysis of the behavior of electron beam welds is simplest when a single number can be assigned to the beam properties that describes the size of the beam spot; this value we generically call the “beam diameter”. This approach has worked well for most applications and electron beam welding machines with the weld dimensions (width and depth) correlating well with the beam diameter. However, in recent weld development for a refractory alloy, Ta-10W, welded with a low voltage electron beam machine (LVEB), it was found that the weld dimensions (weld penetration and weld width) did not correlate well with the beam diameter and especially with the experimentally determined sharp focus point. These data suggest that the presently used definition of beam diameter may not be optimal for all applications. The possible reasons for this discrepancy and a suggested possible alternative diameter definition is the subject of this paper.

  2. Electron beam-cured coating

    International Nuclear Information System (INIS)

    Kishi, Naoyuki

    1976-01-01

    The method for hardening coatings by the irradiation with electron beams is reviewed. The report is divided into seven parts, namely 1) general description and characteristics of electron beam-cured coating, 2) radiation sources of curing, 3) hardening conditions and reaction behaviour, 4) uses and advantages, 5) latest trends of the industry, 6) practice in the field of construction materials, and 7) economy. The primary characteristics of the electron beam hardening is that graft reaction takes place between base resin and coating to produce strong adhesive coating without any pretreatment. A variety of base resins are developed. High class esters of acrylic acid monomers and methacrylic acid monomers are mainly used as dilutants recently. At present, scanning type accelerators are used, but the practical application of the system producing electron beam of curtain type is expected. The dose rate dependence, the repetitive irradiation and the irradiation atmosphere are briefly described. The filed patent applications on the electron beam hardening were analyzed by the officer of Japan Patent Agency. The production lines for coatings by the electron beam hardening in the world are listed. In the electron beam-cured coating, fifty percent of given energy is consumed effectively for the electron beam hardening, and the solvents discharged from ovens and polluting atmosphere are not used, because the paints of high solid type is used. The running costs of the electron beam process are one sixth of the thermal oven process. (Iwakiri, K.)

  3. Glow-discharge-created electron beams and beam-excited lasers

    International Nuclear Information System (INIS)

    Meyer, J.D.

    1989-01-01

    Efficiently created glow discharge electron beams have been developed and studied in detail. The beam mode of operation occurs in the abnormal glow adjacent to the glow-to-arc transition regime. In contrast to electron beams generated in high vacuum from thermionic electron emitting sources, this type of discharge creates electrons directly in soft vacuum by secondary electron emission from cold cathode surfaces following the bombardment of the cathode surface by fast ions and neutral atoms. Factors influencing the efficient electron emission from cold cathodes are presented with emphasis on cathode materials. Sintered ceramic-metal cathodes and oxide-coated cathodes are presented, both of which can produce high power, efficiently generated, d.c. electron beams with discharge currents up to 1 amp (∼130 mA/cm 2 ) at volt ages of up to 6 kV. Novel cathode designs and discharge geometries are presented with specific emphasis on both self-focussed beams emitted from circular cathodes and line-source electron beams emitted from rectangular cathodes forming a thin sheet of electrons. Electrostatically focussed line-source electron beams are spatially characterized by experimentally measuring the effect of discharge parameters and cathode design upon the focussed beam width, focal point, and uniformity. This is achieved by scanning a current collecting detector in three dimensions in order to profile the distribution of electron beam current. Discharge electron beams are further characterized by their electron energy distribution. Measured electron flux energy distributions of transmitted beam electrons in the negative glow are compared to theoretical models. The relative effects of elastic and inelastic collisions mechanisms upon both the overall form and detailed structure of the energy distribution are discussed

  4. Evaporation studies of liquid oxide fuel at very high temperatures using laser beam heating

    International Nuclear Information System (INIS)

    Bober, M.; Breitung, W.; Karow, H.U.; Schretzmann, K.

    1976-11-01

    Evaporation experiments with oxide fuel are carried out based laser beam heating of the fuel specimen surface. The measuring quantities are the recoil momentum of the target, the evaporation area, the evaporation time and the mass and momentum of the supersonic vapor jet expanding into vacuum, and the thermal radiation density of the evaporating surface. From the mechanical measuring quantities we derive the vapor pressure of the target material and, in a first approach, also the evaporation temperature by applying a gas dynamic evaluation model. In a second approach, after having measured the spectral emissivity of liquid UO 2 at 633 nm, we determine the evaporation temperature at the liquid surface also from its thermal radiation. For the determination of the vapor pressure from the measured quantities a gas dynamic evaluation model has been developed. An application limit of the measuring technique is given by onset of plasma interaction of the vapor plume with the incident laser beam at temperatures above 4500 K. Experimental values for the saturated vapor pressure of UO 2 are presented, determined from three series of laser evaporation measurements obtained at temperatures around 3500 K, 3950 K, and 4200 K. The average vapor pressures found are 0.6 bar, 3 bar, and 7 bar, respectively. Laser vapor pressure measurements performed by other authors and theoretical extrapolations of the UO 2 vapor pressure curve known from literature show fairly good agreement within their confidence interval with the vapor pressure measurements reported here. (orig./HR) [de

  5. Electron beams in radiation therapy

    International Nuclear Information System (INIS)

    Bruinvis, I.A.D.

    1987-01-01

    Clinical electron beams in interaction with beam flattening and collimating devices are studied, in order to obtain the means for adequate electron therapy. A treatment planning method for arbitrary field shapes is developed that takes the properties of the collimated electron beams into account. An electron multiple-scattering model is extended to incorporate a model for the loss of electrons with depth, in order to improve electron beam dose planning. A study of ionisation measurements in two different phantom materials yields correction factors for electron beam dosimetry. (Auth.)

  6. Characterization and evaluation of EB-PVD thermal barrier coatings by impedance spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Zhang Chunxia; Liu Fushun; Gong Shengkai; Xu Huibin [School of Materials Science and Engineering, Beihang Univ., Beijing, BJ (China)

    2005-07-01

    Two layer thermal barrier coatings (TBCs) were prepared by EB-PVD (electron beam-physical vapor deposition) at different substrate temperatures in the range of 823 to 1123 K, and their microstructure was investigated with SEM and AC impedance as a function of substrate temperature and thermal cycling time. YSZ layer of all TBCs samples is in column structure, but the grain size and growth orientation are different with substrate. In this research, impedance spectra (IS) was measured as a function of thermal cycling between 1323 K and 298 K for these thermal barrier coatings. Grain boundary and bulk can be distinguished from analysis of AC impedance spectroa to provide information about the relation between microstructure and electric properties. The change in IS until failure was found to be related with the thickness, microcracks and macrocracks of TGO and the change in the interfacial of TGO/YSZ. (orig.)

  7. Erosion resistance of composite materials on titanium, zirconium and aluminium nitride base under the electron beam effect

    International Nuclear Information System (INIS)

    Verkhoturov, A.D.; Kuzenkova, M.A.; Slutskin, M.G.; Kravchuk, L.A.

    1977-01-01

    Erosion resistance of composites based on nitrides of titanium, zirconium and aluminium to spark and electron beam processing has been studied. The erosion resistance in spark processing is shown to depend on specific electric resistance of the alloys. TiN-AlN and ZrN-AlN alloys containing more than 70% AlN (with specific electric resistance more than 10 6 -10 7 ohm/cm) caot be processed by spark method. It is shown that erosion of the composites by an electron beam depends primarily on the rate of evaporation of the components

  8. Improving the characteristics of Sn-doped In2O2 grown at room temperature with oxygen radical-assisted electron beam deposition

    Science.gov (United States)

    Oh, Min-Suk; Seo, Inseok

    2017-07-01

    Sn-doped In2O3 (Indium tin oxide, ITO) is widely utilized in numerous industrial applications due to its high electrical conductivity and high optical transmittance in the visible region. High quality ITO thin-films have been grown at room temperature by oxygen radical assisted e-beam evaporation without any post annealing or plasma treatment. The introduction of oxygen radicals during e-beam growth greatly improved the surface morphology and structural properties of the ITO films. The obtained ITO film exhibits higher carrier mobility of 43.2 cm2/V·s and larger optical transmittance of 84.6%, resulting in a higher figure of merit of ˜ 2.8 × 10-2 Ω-1, which are quite comparable to the ITO film deposited by conventional e-beam evaporation. These results show that ITO films grown by oxygen radical assisted e-beam evaporation at room temperature with high optical transmittance and high electron conductivity have a great potential for organic optoelectronic devices.

  9. Titanium carbide coatings on molybdenum by means of reactive sputtering and electron beam techniques

    International Nuclear Information System (INIS)

    Obata, T.; Aida, H.; Hirohata, Y.; Mohri, M.; Yamashina, T.

    1982-01-01

    This study is an experimental investigation of TiC coatings on Mo substrate by means of a reactive r.f. sputtering in the presence of CH 4 and a chemical reaction with interdiffusion in the sandwich structure of Ti/C/Mo by electron beam evaporation and heating. Using the reactive sputtering method, a homogeneous TiC coating with stoichiometric composition and good adhesion could be produced in the conditions of the partial pressure range of CH 4 , 2 approx. equal to 5 x 10 -4 Torr (total pressure, Psub(Ar) + Psub(CH) 4 = 5.6 x 10 -2 Torr) at 300 0 C (substrate). By using the electron beams, successively evaporated carbon and Ti on a Mo substrate was heated to 700 0 C to form a TiC surface layer on the top which then remained stable during further heating to 1000 0 C. Godd adhesion was brought about by interdiffusion to produce Mo 2 C layer between TiC layer and Mo substrate. It was also found that further heating of the coating layers subsequent to Ti evaporation on the TiC layer produced thicker TiC layer due to a chemical reaction between Ti and inner carbon layers. This could be a promising method of in situ replenishment for TiC coatings on the first wall and the limiter materials. (orig.)

  10. Real-time kinetic modeling of YSZ thin film roughness deposited by e-beam evaporation technique

    International Nuclear Information System (INIS)

    Galdikas, A.; Cerapaite-Trusinskiene, R.; Laukaitis, G.; Dudonis, J.

    2008-01-01

    In the present study, the process of yttrium-stabilized zirconia (YSZ) thin films deposition on optical quartz (SiO 2 ) substrates using e-beam deposition technique controlling electron gun power is analyzed. It was found that electron gun power influences the non-monotonous kinetics of YSZ film surface roughness. The evolution of YSZ thin film surface roughness was analyzed by a kinetic model. The model is based on the rate equations and includes processes of surface diffusion of the adatoms and the clusters, nucleation, growth and coalescence of islands in the case of thin film growth in Volmer-Weber mode. The analysis of the experimental results done by modeling explains non-monotonous kinetics and dependence of the surface roughness on the electron gun power. A good quantitative agreement with experimental results is obtained taking into account the initial roughness of the substrate surface and the amount of the clusters in the flux of evaporated material.

  11. Growth and applications of superconducting Y-Ba-Cu-O thin films

    International Nuclear Information System (INIS)

    Pinto, R.

    1991-01-01

    This paper attempt to highlight the important PVD techniques such as evaporation, sputtering, ion beam deposition and excimer laser ablation for the preparation of superconducting YBaCuO thin films. Since enormous amount of work has been published over the last few years, this review is not comprehensive even in PVD techniques. In the area of applications for electronics, thin film appear to be much more promising than bulk high T c superconductors. Already high J c values in the region of 4 x 10 6 A cm -2 have been realized in thin films. Resonators and transmission lines have been fabricated using 123 films showing a transmission loss significantly lower than that of copper at 77 degrees K at X-band frequencies. This review will discuss some of the important electronic applications feasible with 123 films

  12. Rate Control in Dual Source Evaporation

    NARCIS (Netherlands)

    Wielinga, T.; Gruisinga, W.; Leeuwis, H.; Lodder, J.C.; van Weers, J.F.; Wilmans, J.C.

    1980-01-01

    Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used

  13. Relativistic electron beams above thunderclouds

    DEFF Research Database (Denmark)

    Füellekrug, M.; Roussel-Dupre, R.; Symbalisty, E. M. D.

    2011-01-01

    Non-luminous relativistic electron beams above thunderclouds have been detected by the radio signals of low frequency similar to 40-400 kHz which they radiate. The electron beams occur similar to 2-9 ms after positive cloud-to-ground lightning discharges at heights between similar to 22-72 km above...... thunderclouds. Intense positive lightning discharges can also cause sprites which occur either above or prior to the electron beam. One electron beam was detected without any luminous sprite which suggests that electron beams may also occur independently of sprites. Numerical simulations show that beams...... of electrons partially discharge the lightning electric field above thunderclouds and thereby gain a mean energy of similar to 7MeV to transport a total charge of similar to-10mC upwards. The impulsive current similar to 3 x 10(-3) Am-2 associated with relativistic electron beams above thunderclouds...

  14. Supramolecular structure of a perylene derivative in thin films made by vacuum thermal evaporation

    International Nuclear Information System (INIS)

    Fernandes, Jose Diego

    2015-01-01

    The supramolecular arrangement of organic thin films is a factor that influences both optical and electrical properties of these films and, consequently, the technological applications involving organic electronics. In this dissertation, thin films of a perylene derivative (bis butylimido perylene, acronym BuPTCD) were produced by physical vapor deposition (PVD) using vacuum thermal evaporation. The aim of this work was to investigate the supramolecular arrangement of BuPTCD films, which implies to control the thickness at nanometer scale and to determine the molecular organization, the morphology (at nano and micrometer scales) and the crystallinity, besides the stability of this arrangement as a function of the temperature. Optical properties (such as absorption and emission) and electrical properties (such as conductivity and photoconductivity) were also determined. The UV-Vis absorption spectra revealed a controlled growth (uniform) of the BuPTCD films. Atomic force and optical microscopy images showed a homogeneous surface of the film at nano and micrometer scales, respectively. The X-ray diffraction showed that the BuPTCD powder and PVD film have different crystalline structures, with the BuPTCD molecules head-on oriented in the PVD films, supported on the substrate surface by the side group (FTIR). This structure favors the light emission (photoluminescence) by the formation of excimers. The thermal treatment (200°C for 10 min) does not affect the molecular organization of the PVD films, showing a thermal stability of the BuPTCD supramolecular arrangement under these circumstances. The electrical measurements (DC) showed a linear increase of the current as a function of the tension, which is characteristic of ohmic behavior. Also, the films exhibited an increase of current by 2 orders of magnitude when exposed to light (photoconductive properties). Finally, BuPTCD films were exposed to vapor of trifluoroacetic acid (TFA) to verify the sensitivity of the Bu

  15. Electron beam welding

    International Nuclear Information System (INIS)

    Gabbay, M.

    1972-01-01

    The bead characteristics and the possible mechanisms of the electron beam penetration are presented. The different welding techniques are exposed and the main parts of an electron beam welding equipment are described. Some applications to nuclear, spatial and other industries are cited [fr

  16. Model of convection mass transfer in titanium alloy at low energy high current electron beam action

    Science.gov (United States)

    Sarychev, V. D.; Granovskii, A. Yu; Nevskii, S. A.; Konovalov, S. V.; Gromov, V. E.

    2017-01-01

    The convection mixing model is proposed for low-energy high-current electron beam treatment of titanium alloys, pre-processed by heterogeneous plasma flows generated via explosion of carbon tape and powder TiB2. The model is based on the assumption vortices in the molten layer are formed due to the treatment by concentrated energy flows. These vortices evolve as the result of thermocapillary convection, arising because of the temperature gradient. The calculation of temperature gradient and penetration depth required solution of the heat problem with taking into account the surface evaporation. However, instead of the direct heat source the boundary conditions in phase transitions were changed in the thermal conductivity equation, assuming the evaporated material takes part in the heat exchange. The data on the penetration depth and temperature distribution are used for the thermocapillary model. The thermocapillary model embraces Navier-Stocks and convection heat transfer equations, as well as the boundary conditions with the outflow of evaporated material included. The solution of these equations by finite elements methods pointed at formation of a multi-vortices structure when electron-beam treatment and its expansion over new zones of material. As the result, strengthening particles are found at the depth exceeding manifold their penetration depth in terms of the diffusion mechanism.

  17. Controlling Dielectric and Magnetic Properties of PVdF/Magnetite Nanocomposite Fibre Webs

    Directory of Open Access Journals (Sweden)

    A. P. Venugopal

    2014-01-01

    Full Text Available The ability of filtration and separation media containing fibres to remove impurities from oil, water, and blood can be enhanced using magnetic fields. The ability to regulate the dielectric and magnetic behaviour of fibrous webs in terms of superparamagnetic or ferromagnetic properties by adjusting material composition is fundamental to meeting end-use requirements. Electrospun fibres were produced from PVdF (polyvinylidene fluoride and nanomagnetite (Fe3O4 nanoparticles from solutions of PVdF in dimethylacetamide containing Fe3O4 nanoparticle contents ranging from 3 to 10 wt%. Fibre dimensions, morphology, and nanoparticle agglomeration were characterised by environmental scanning electron microscopy (ESEM and field emission gun transmission electron microscopy (FEGTEM. Dielectric behaviour of the fibre webs was influenced by web porosity and the Fe3O4 nanoparticle content. Impedance analysis of the webs indicated an increase in dielectric constant of ∼80% by the addition of 10 wt% Fe3O4 nanoparticles compared to 100 wt% PVdF. The dielectric constants of the webs were compared with those obtained from the theoretical mixing models of Maxwell and Lichtenecker. Vibrating sample magnetometer (VSM magnetisation measurements indicated a blocking temperature above 300 K suggesting ferrimagnetic rather than superparamagnetic behaviour as a result of Fe3O4 nanoparticle agglomeration within fibres.

  18. Growth of TiC films by Pulsed Laser Evaporation (PLE) and characterization by XPS and AES

    International Nuclear Information System (INIS)

    Rist, O.; Murray, P.T.

    1991-01-01

    Thin films of TiC with a thickness of some 100 nm have been grown on Si(100) substrates by Pulsed Laser Evaporation (PLE). Advantages of PLE in comparison with more conventional growth methods e.g. PVD or CVD are reported. The feasibility of growing stoichiometric thin films of TiC by PLE was investigated. These films produced have been analysed in situ by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). XPS results and Auger sputter depht profiles indicate that the films grown between RT and 500degC are stoichiometric TiC. Film/substrate interdiffusion is observed at 600degC substrate temperature and higher. (orig.)

  19. MODULATED PLASMA ELECTRON BEAMS

    Energy Technology Data Exchange (ETDEWEB)

    Stauffer, L. H.

    1963-08-15

    Techniques have been developed for producing electron beams of two amperes or more, from a plasma within a hollow cathode. Electron beam energies of 20 kilovolts are readily obtained and power densities of the order of 10,000 kilowatts per square inch can be obtained with the aid of auxiliary electromagnetic focusing. An inert gas atmosphere of a few microns pressure is used to initiate and maintain the beam. Beam intensity increases with both gas pressure and cathode potential but may be controlled by varying the potential of an internal electrode. Under constant pressure and cathode potential the beam intensity may be varied over a wide range by adjusting the potential of the internal control electrode. The effects of cathode design on the volt-ampere characteristics of the beam and the design of control electrodes are described. Also, performance data in both helium and argon are given. A tentative theory of the origin of electrons and of beam formation is proposed. Applications to vacuum metallurgy and to electron beam welding are described and illustrated. (auth)

  20. Disruption simulation experiment using high-frequency rastering electron beam as the heat source

    International Nuclear Information System (INIS)

    Yamazaki, S.; Seki, M.

    1987-01-01

    The disruption is a serious event which possibly reduces the lifetime of plasm interactive components, so the effects of the resulting high heat flux on the wall materials must be clearly identified. The authors performed disruption simulation experiments to investigate melting, evaporation, and crack initiation behaviors using an electron beam facility as the heat source. The facility was improved with a high-frequency beam rastering system which provided spatially and temporally uniform heat flux on wider test surfaces. Along with the experiments, thermal and mechanical analyses were also performed. A two-dimensional disruption thermal analysis code (DREAM) was developed for the analyses

  1. Microstructure Evolution of Electron Beam Physical Vapour Deposited Ni-23.5Cr-2.66Co-1.44Al Superalloy Sheet During Annealing at 600 °C

    Directory of Open Access Journals (Sweden)

    Li Mingwei

    2013-02-01

    Full Text Available Microstructure evolution of electron beam physical vapour deposited (EB-PVD Ni‑23.5Cr‑2.66Co‑1.44Al superalloy sheet during annealing at 600 °C was investigated. The results showed that the as-deposited alloy was composed of only g phase. After annealing at 600 °C, the locations of diffraction peaks were still the same. The (220 diffraction peak of the deposition side increased with annealing time. The sheet on deposited side had a tendency toward forming (220 texture during post-annealing. No obvious texture was observed at as-deposited and annealed sheet at 600 °C in substrate side. The count and size of "voids" decreased with time. The size of grains increased obviously with annealing time. The ultimate tensile strength of EB-PVD Ni-23.5Cr-2.66Co-1.44Al alloy sheet increased from 641 MPa to 829 MPa after annealing at 600 °C for 30 hours.

  2. Electron beams and applications

    International Nuclear Information System (INIS)

    Haouat, G.; Couillaud, C.

    1998-01-01

    Studies of the physical properties of the ELSA-linac electron beam are presented. They include measurements of the characteristic beam parameter and analyzes of the beam transport using simulation codes. The aim of these studies is to determine the best conditions for production of intense and very short electron bunches and to optimize the transport of space-charge dominated beams. Precise knowledge of the transport dynamics allows to produce beams with the required characteristics for light production in Free-Electron Laser (FEL), and to give a good description of energy-transfer phenomena between electrons and photons in the wriggler. The particular features of ELSA authorize studies of high-intensity, high-brightness beam properties, especially the halo surrounding the dense core of the electron bunches, which is formed by the space charge effects. It is also shown that the ELSA facility is well suited for the fabrication of very short γ and X-rays sources for applied research in nuclear and plasma physics, or for time response studies of fast detectors. (author)

  3. Design and development of a ring cathode electron gun as an evaporation source

    Energy Technology Data Exchange (ETDEWEB)

    Poyner, G T [Craswell Scientific Ltd., Cheltenham (UK)

    1976-11-01

    The RG2 ring cathode gun is a simple application of electron beam heating. The gun described was developed to provide a relatively inexpensive source for evaporating a range of metals and oxides which were otherwise difficult or impossible to evaporate by conventional resistance heating. Following several stages of improvement the gun was progressively reduced in size and the 'optics', or focusing, improved so that in its existing state an area of approximately 2mm diameter is heated. It was decided to limit the accelerating voltage as far as possible to minimize the practical problems associated with its operation and also the manufacture of the power supply. As development proceeded it became apparent that the relatively low accelerating voltage chosen improved the flexibility of the gun. Two versions are manufactured, the first, equipped with a six position rotary hearth, and the second, utilising a single hearth, is intended to be used as one of a pair. The latter design was reduced in size even further in order to minimize the distance between two adjacent guns.

  4. Improved cyclic oxidation resistance of electron beam physical vapor deposited nano-oxide dispersed {beta}-NiAl coatings for Hf-containing superalloy

    Energy Technology Data Exchange (ETDEWEB)

    Guo Hongbo [School of Materials Science and Engineering, Beihang University, No. 37, Xueyuan Road, Beijing 100191 (China); Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, Beihang University, No. 37, Xueyuan Road, Beijing 100191 (China)], E-mail: Guo.hongbo@buaa.edu.cn; Cui Yongjing; Peng Hui; Gong Shengkai [School of Materials Science and Engineering, Beihang University, No. 37, Xueyuan Road, Beijing 100191 (China); Beijing Key Laboratory for Advanced Functional Materials and Thin Film Technology, Beihang University, No. 37, Xueyuan Road, Beijing 100191 (China)

    2010-04-15

    Oxide dispersed (OD) {beta}-NiAl coatings and OD-free {beta}-NiAl coatings were deposited onto a Hf-containing Ni-based superalloy by electron beam physical vapor deposition (EB-PVD). Excessive enrichment of Hf was found in the TGO on the OD-free coating due to outward diffusion of Hf from the superalloy, causing accelerated TGO thickening and spalling. The OD-coating effectively prevented Hf from outward diffusion. Only small amount of Hf diffused to the coating surface and improved the TGO adherence by virtue of the reactive element effect. The OD-coating exhibited an improved oxidation resistance as compared to the OD-free coating.

  5. Electron-beam lithography

    International Nuclear Information System (INIS)

    Harriott, L.; Liddle, A.

    1997-01-01

    As part of a commemorative series of articles to mark the hundredth anniversary of the discovery of the electron, this article describes the use of electron beams to write features on silicon wafers. Recent advances in electron beam lithography, as it is known, could enable this technology to be used for the mass manufacture of silicon chips. The validation of space-charge optimization and evaluation of printing techniques is underway. (UK)

  6. Analyser of sweeping electron beam

    International Nuclear Information System (INIS)

    Strasser, A.

    1993-01-01

    The electron beam analyser has an array of conductors that can be positioned in the field of the sweeping beam, an electronic signal treatment system for the analysis of the signals generated in the conductors by the incident electrons and a display for the different characteristics of the electron beam

  7. Ion beam neutralization with ferroelectrically generated electron beams

    Energy Technology Data Exchange (ETDEWEB)

    Herleb, U; Riege, H [European Organization for Nuclear Research, Geneva (Switzerland). LHC Division

    1997-12-31

    A technique for ion beam space-charge neutralization with pulsed electron beams is described. The intensity of multiply-charged ions produced with a laser ion source can be enhanced or decreased separately with electron beam trains of MHz repetition rate. These are generated with ferroelectric cathodes, which are pulsed in synchronization with the laser ion source. The pulsed electron beams guide the ion beam in a similar way to the alternating gradient focusing of charged particle beams in circular accelerators such as synchrotrons. This new neutralization technology overcomes the Langmuir-Child space-charge limit and may in future allow ion beam currents to be transported with intensities by orders of magnitude higher than those which can be accelerated today in a single vacuum tube. (author). 6 figs., 10 refs.

  8. Effect of Hf Additions to Pt Aluminide Bond Coats on EB-PVD TBC Life

    Science.gov (United States)

    Nesbitt, James; Nagaraj, Ben; Williams, Jeffrey

    2000-01-01

    Small Hf additions were incorporated into a Pt aluminide coating during chemical vapor deposition (CVD) on single crystal RENE N5 substrates. Standard yttria-stabilized zirconia top coats were subsequently deposited onto the coated substrates by electron beam-physical vapor deposition (EB-PVD). The coated substrates underwent accelerated thermal cycle testing in a furnace at a temperature in excess of 1121 C (2050 F) (45 minute hot exposure, 15 minute cool to approximately 121 C (250 F)) until the thermal barrier coating (TBC) failed by spallation. Incorporating Hf in the bond coat increased the TBC life by slightly more than three times that of a baseline coating without added Hf. Scanning electron microscopy of the spalled surfaces indicated that the presence of the Hf increased the adherence of the thermally grown alumina to the Pt aluminide bond coat. The presence of oxide pegs growing into the coating from the thermally grown alumina may also partially account for the improved TBC life by creating a near-surface layer with a graded coefficient of thermal expansion.

  9. Electron beam lithography

    International Nuclear Information System (INIS)

    Harriott, L.; Liddle, A.

    1997-01-01

    As part of a commemorative series of articles to mark the hundredth anniversary of the discovery of the electron, this article describes the use of electron beams to write features on silicon wafers. Recent advances in electron beam lithography, as it is known, could enable this technology to be used for the mass manufacture of silicon chips. The validation of space-charge optimization and evaluation of printing techniques is underway. 5 figs

  10. Intense electron and ion beams

    CERN Document Server

    Molokovsky, Sergey Ivanovich

    2005-01-01

    Intense Ion and Electron Beams treats intense charged-particle beams used in vacuum tubes, particle beam technology and experimental installations such as free electron lasers and accelerators. It addresses, among other things, the physics and basic theory of intense charged-particle beams; computation and design of charged-particle guns and focusing systems; multiple-beam charged-particle systems; and experimental methods for investigating intense particle beams. The coverage is carefully balanced between the physics of intense charged-particle beams and the design of optical systems for their formation and focusing. It can be recommended to all scientists studying or applying vacuum electronics and charged-particle beam technology, including students, engineers and researchers.

  11. Absolute beam-charge measurement for single-bunch electron beams

    International Nuclear Information System (INIS)

    Suwada, Tsuyoshi; Ohsawa, Satoshi; Furukawa, Kazuro; Akasaka, Nobumasa

    2000-01-01

    The absolute beam charge of a single-bunch electron beam with a pulse width of 10 ps and that of a short-pulsed electron beam with a pulse width of 1 ns were measured with a Faraday cup in a beam test for the KEK B-Factory (KEKB) injector linac. It is strongly desired to obtain a precise beam-injection rate to the KEKB rings, and to estimate the amount of beam loss. A wall-current monitor was also recalibrated within an error of ±2%. This report describes the new results for an absolute beam-charge measurement for single-bunch and short-pulsed electron beams, and recalibration of the wall-current monitors in detail. (author)

  12. Compact electron beam focusing column

    Science.gov (United States)

    Persaud, Arun; Leung, Ka-Ngo; Reijonen, Jani

    2001-12-01

    A novel design for an electron beam focusing column has been developed at LBNL. The design is based on a low-energy spread multicusp plasma source which is used as a cathode for electron beam production. The focusing column is 10 mm in length. The electron beam is focused by means of electrostatic fields. The column is designed for a maximum voltage of 50 kV. Simulations of the electron trajectories have been performed by using the 2D simulation code IGUN and EGUN. The electron temperature has also been incorporated into the simulations. The electron beam simulations, column design and fabrication will be discussed in this presentation.

  13. The effect of PVD coatings on the corrosion behaviour of AZ91 magnesium alloy

    International Nuclear Information System (INIS)

    Altun, Hikmet; Sen, Sadri

    2006-01-01

    In this study, multilayered AlN (AlN + AlN + AlN) and AlN + TiN were coated on AZ91 magnesium alloy using physical vapour deposition (PVD) technique of DC magnetron sputtering, and the influence of the coatings on the corrosion behaviour of the AZ91 alloy was examined. A PVD system for coating processes, a potentiostat for electrochemical corrosion tests, X-ray difractometer for compositional analysis of the coatings, and scanning electron microscopy for surface examinations were used. It was determined that PVD coatings deposited on AZ91 magnesium alloy increased the corrosion resistance of the alloy, and AlN + AlN + AlN coating increased the corrosion resistance much more than AlN + TiN coating. However, it was observed that, in the coating layers, small structural defects e.g., pores, pinholes, cracks that could arise from the coating process or substrate and get the ability of protection from corrosion worsened were present

  14. Enhanced oxidation resistance of SiC coating on Graphite by crack healing at the elevated temperature

    Energy Technology Data Exchange (ETDEWEB)

    Park, Jae-Won; Kim, Eung-Seon; Kim, Jae-Un; Kim, Yoo-Taek [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of); Windes, William E. [Idaho National Laboratory, Idaho (United States)

    2015-10-15

    An oxidation protective SiC coating on the graphite components could assist in slowing the oxidation down. However, the irradiation induced dimensional changes in the graphite (shrinkage followed by swelling) can occur, while the SiC CVD coating has been reported to swell even at a low dose neutron irradiation. In this work, functionally gradient electron beam evaporative coating with an ion beam processing was firstly conducted and then SiC coating on the FG coating to the desired thickness is followed. For the crack healing, both the repeated EB-PVD and CVD were performed. Oxidation and thermal cycling tests of the coated specimens were performed and reflected in the process development. In this work, efforts have been paid to heal the cracks in the SiC coated layer on graphite with both EB-PVD and CVD. CVD seems to be more appropriate coating method for crack healing probably due to its excellent crack-line filling capability for high density and high aspect ratio.

  15. A study on the high velocity impact behavior of titanium alloy by PVD method

    International Nuclear Information System (INIS)

    Sohn, Se Won; Lee, Doo Sung; Hong, Sung Hee

    2001-01-01

    In order to investigate the fracture behaviors(penetration modes) and resistance to penetration during ballistic impact of titanium alloy laminates and nitrified titanium alloy laminates which were treated by PVD(Physical Vapor Deposition) method, ballistic tests were conducted. Evaporation, sputtering, and ion plating are three kinds of PVD method. In this research, ion plating was used to achieve higher surface hardness and surface hardness test were conducted using a micro Vicker's hardness tester. Resistance to penetration is determined by the protection ballistic limit(V 50 ), a statistical velocity with 50% probability for complete penetration. Fracture behaviors and ballistic tolerance, described by penetration modes, are respectfully observed at and above ballistic limit velocities, as a result of V 50 test and Projectile Through Plates(PTP) test methods. PTP tests were conducted with 0 .deg. obliquity at room temperature using 5.56mm ball projectile. V 50 tests with 0 .deg. obliquity at room temperature were conducted with projectiles that were able to achieve near or complete penetration during PTP tests. Surface hardness, resistance to penetration, and penetration modes of titanium alloy laminates are compared to those of nitrified titanium alloy laminates

  16. Applications of electron lenses: scraping of high-power beams, beam-beam compensation, and nonlinear optics

    Energy Technology Data Exchange (ETDEWEB)

    Stancari, Giulio

    2014-09-11

    Electron lenses are pulsed, magnetically confined electron beams whose current-density profile is shaped to obtain the desired effect on the circulating beam. Electron lenses were used in the Fermilab Tevatron collider for bunch-by-bunch compensation of long-range beam-beam tune shifts, for removal of uncaptured particles in the abort gap, for preliminary experiments on head-on beam-beam compensation, and for the demonstration of halo scraping with hollow electron beams. Electron lenses for beam-beam compensation are being commissioned in the Relativistic Heavy Ion Collider (RHIC) at Brookhaven National Laboratory (BNL). Hollow electron beam collimation and halo control were studied as an option to complement the collimation system for the upgrades of the Large Hadron Collider (LHC) at CERN; a conceptual design was recently completed. Because of their electric charge and the absence of materials close to the proton beam, electron lenses may also provide an alternative to wires for long-range beam-beam compensation in LHC luminosity upgrade scenarios with small crossing angles. At Fermilab, we are planning to install an electron lens in the Integrable Optics Test Accelerator (IOTA, a 40-m ring for 150-MeV electrons) as one of the proof-of-principle implementations of nonlinear integrable optics to achieve large tune spreads and more stable beams without loss of dynamic aperture.

  17. Rippled beam free electron laser amplifier

    Science.gov (United States)

    Carlsten, Bruce E.

    1999-01-01

    A free electron laser amplifier provides a scalloping annular electron beam that interacts with the axial electric field of a TM.sub.0n mode. A waveguide defines an axial centerline and, a solenoid arranged about the waveguide produces an axial constant magnetic field within the waveguide. An electron beam source outputs a annular electron beam that interacts with the axial magnetic field to have an equilibrium radius and a ripple radius component having a variable radius with a ripple period along the axial centerline. An rf source outputs an axial electric field that propagates within the waveguide coaxial with the electron beam and has a radial mode that interacts at the electron beam at the equilibrium radius component of the electron beam.

  18. Self-focusing of laser beams in magnetized relativistic electron beams

    International Nuclear Information System (INIS)

    Whang, M.H.; Ho, A.Y.; Kuo, S.P.

    1989-01-01

    Recently, there is considerable interest in radiation focusing and optical guiding using the resonant interaction between the radiation field and electron beam. The result of radiation focusing has been shown to play a central role in the practical utilization of the FEL. This result allows the device to use longer interaction length for achieving higher output power. Likewise, the possibility of self-focusing of the laser beam in cyclotron resonance with a relativistic electron beam is also an important issue in the laser acceleration concepts for achieving high-gradient electron acceleration. The effectiveness of the acceleration process relies strongly on whether the laser intensity can be maintained at the desired level throughout the interaction. In this work, the authors study the problem concerning the self-focusing of laser beam in the relativistic electron beams under the cyclotron auto-resonance interaction. They assume that there is no electron density perturbation prohibited from the background magnetic field for the time scale of interest. The nonlinearity responsible for self-focusing process is introduced by the energy dependence of the relativistic mass of electrons. The plasma frequency varies with the electron energy which is proportional to the radiation amplitude. They then examine such a relativistic nonlinear effect on the propagation of a Gaussian beam in the electron beam. A parametric study of the dependence of the laser beam width on the axial position for various electron beam density has been performed

  19. The design and development of a ring cathode electron gun as an evaporation source

    International Nuclear Information System (INIS)

    Poyner, G.T.

    1976-01-01

    The RG2 ring cathode gun is a simple application of electron beam heating. The gun described was developed to provide a relatively inexpensive source for evaporating a range of metals and oxides which were otherwise difficult or impossible to evaporate by conventional resistance heating. Following several stages of improvement the gun was progressively reduced in size and the 'optics', or focusing, improved so that in its existing state an area of approximately 2mm diameter is heated. It was decided to limit the accelerating voltage as far as possible to minimize the practical problems associated with its operation and also the manufacture of the power supply. As development proceeded it became apparent that the relatively low accelerating voltage chosen improved the flexibility of the gun. Two versions are manufactured, the first, equipped with a six position rotary hearth, and the second, utilising a single hearth, is intended to be used as one of a pair. The latter design was reduced in size even further in order to minimize the distance between two adjacent guns. (author)

  20. Thermal-mechanical simulation of high-current pulsed electron beam surface modification process of pure aluminum

    International Nuclear Information System (INIS)

    Zou Jianxin; Qin Ying; Wu Aimin; Hao Shengzhi; Wang Xiaogang; Dong Chuang

    2004-01-01

    A mathematical physics model is established to describe the surface modification process of High Current Pulsed Electron Beams (HCPEB) of pure aluminum alloy. Computer simulation is used to reveal the phenomena of fast heating and cooling, melting, solidification, evaporation, and thermal stress wave associated with the HCPEB bombardment. The calculated melting depth is about 1-10 μm, which is close to the experimental results. The evaporated layer is at nanometer level, which can be omitted in the calculation of temperature field. The thermal stress wave, though as weak as about 0.1 MPa in peak amplitude (proportional to pulsed energy density), has strong impacts on material's structure and properties. (authors)

  1. Relation of Thermal Conductivity with Process Induced Anisotropic Void Systems in EB-PVD PYSZ Thermal Barrier Coatings

    Energy Technology Data Exchange (ETDEWEB)

    Renteria, A. Flores; Saruhan-Brings, B.; Ilavsky, J.

    2008-03-03

    Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 11000C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

  2. Relation of thermal conductivity with process induced anisotropic void system in EB-PVD PYSZ thermal barrier coatings.

    Energy Technology Data Exchange (ETDEWEB)

    Renteria, A. F.; Saruhan, B.; Ilavsky, J.; German Aerospace Center

    2007-01-01

    Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based ,TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 1100C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

  3. An aluminium evaporation source for ion plating

    International Nuclear Information System (INIS)

    Walley, P.A.; Cross, K.B.

    1977-01-01

    Ion plating with aluminium is becoming increasingly accepted as a method of anti-corrosion surface passivation, the usual requirements being for a layer between 12 and 50 microns in thickness, (0.0005 to 0.002). The evaporation system described here offers a number of advantages over high power electron beam sources when used for aluminium ion plating. The source consists of a resistively heated, specially shaped, boron nitride-titanium diboride boat and a metering feed system. Its main features are small physical size, soft vacuum compatibility, low power consumption and metered evaporation output. (author)

  4. Apparatus for irradiation with electron beam

    International Nuclear Information System (INIS)

    Uehara, K.; Ito, A.; Nishimune, K.; Fujita, K.

    1976-01-01

    An irradiation apparatus with high energy electrons is disclosed in which a wire shaped or linear object to be irradiated is moved back and forth many times under an electron window so as to irradiate it with an electron beam. According to one feature of the invention, an electron beam, which leaks through gaps between the objects to be irradiated or which penetrates the objects to be irradiated, is reversed by a magnetic field approximately perpendicular to the scanning face of the electron beam by means of a magnet which is disposed under the objects to be irradiated, and the reversed electron beam is thereby again applied to the objects to be irradiated. A high utilization rate of the electron beam is accomplished, and the objects can be thereby uniformly irradiated with the electron beam. 4 claims, 6 drawing figures

  5. Indium-tin-oxide thin film deposited by a dual ion beam assisted e-beam evaporation system

    International Nuclear Information System (INIS)

    Bae, J.W.; Kim, J.S.; Yeom, G.Y.

    2001-01-01

    Indium-tin-oxide (ITO) thin films were deposited on polycarbonate (PC) substrates at low temperatures (<90 deg. C) by a dual ion beam assisted e-beam evaporation system, where one gun (gun 1) is facing ITO flux and the other gun (gun 2) is facing the substrate. In this experiment, effects of rf power and oxygen flow rate of ion gun 2 on the electrical and optical properties of depositing ITO thin films were investigated. At optimal deposition conditions, ITO thin films deposited on the PC substrates larger than 20 cmx20 cm showed the sheet resistance of less than 40 Ω/sq., the optical transmittance of above 90%, and the uniformity of about 5%

  6. Improved mechanical properties of Ni-rich Ni3Al coatings produced by EB-PVD for repairing single crystal blades

    Institute of Scientific and Technical Information of China (English)

    Jing-Yong Sun; Yan-Ling Pei; Shu-Suo Li; Hu Zhang; Sheng-Kai Gong

    2017-01-01

    Active control of turbine blade tip clearance for aircraft engine continues to be a concern in engine operation,because turbine blades are subjected to wear and therefore cause an increasing tip clearance between the rotating blades and the shroud and also reduce the engine efficiency.In this work,a Ni-rich Ni3Al coating with γ'/γtwo-phase microstructure was deposited by electron beam physical vapor deposition (EB-PVD),which worked as repairing the worn blade tips of single crystal blades.Nb molten pool was used to increase the molten pool temperature and thus to enhance the deposition rate.The microstructures and mechanical properties can be modified by the deposition temperatures and the following heat treatments.All coatings consist of γ'and γ phases.At deposition temperature of 600 ℃,a dense microstructure can be achieved to produce a coating with grain size of ~ 1 μm and microhardness of ~HV 477.After being heated for 4 h at a temperature of 1,100 ℃,the coatings have a more uniform microstructure,and microhardness maintains at a high level of ~ HV 292.Effect of Hf and Zr on EB-PVD Ni3Al repair coating will be further investigated.

  7. Electron beam simulation applicators

    International Nuclear Information System (INIS)

    Purdy, J.A.

    1983-01-01

    A system for simulating electron beam treatment portals using low-temperature melting point alloy is described. Special frames having the same physical dimensions as the electron beam applicators used on the Varian Clinac 20 linear accelerator were designed and constructed

  8. Influence of the evaporation rate and the evaporation mode on the hydrogen sorption kinetics of air-exposed magnesium films

    International Nuclear Information System (INIS)

    Leon, A.; Knystautas, E.J.; Huot, J.; Schulz, R.

    2006-01-01

    It has been shown that the hydrogen sorption properties of air-exposed magnesium films are influenced by the deposition parameters such as the evaporation rate or the evaporation mode used during their preparation. As the evaporation rate increases, the structure of the film tends to be highly oriented along the [002] direction and the kinetics of hydrogen absorption and desorption are faster. Moreover, the hydrogen sorption kinetics of magnesium films prepared with an electron beam source under a high vacuum are faster by almost a factor of two compared to those prepared using resistive heating under low vacuum. These two parameters reduce drastically the activation and the incubation period during hydrogen absorption and desorption, respectively

  9. Structural and electrical properties of epitaxial Si layers prepared by E-beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Dogan, P. [Hahn-Meitner-Institut Berlin, Kekulestr. 5, 12489 Berlin (Germany)], E-mail: pinar.dogan@hmi.de; Rudigier, E.; Fenske, F.; Lee, K.Y.; Gorka, B.; Rau, B.; Conrad, E.; Gall, S. [Hahn-Meitner-Institut Berlin, Kekulestr. 5, 12489 Berlin (Germany)

    2008-08-30

    In this work, we present structural and electrical properties of thin Si films which are homoepitaxially grown at low substrate temperatures (T{sub s} 450-700 deg. C) by high-rate electron beam evaporation. As substrates, monocrystalline Si wafers with (100) and (111) orientations and polycrystalline Si (poly-Si) seed layers on glass were used. Applying Secco etching, films grown on Si(111) wafers exhibit a decreasing etch pit density with increasing T{sub s}. The best structural quality of the films was obtained on Si(100) wafers. Defect etching on epitaxially grown poly-Si absorbers reveal regions with different crystalline quality. Solar cells have been prepared on both wafers and seed layers. Applying Rapid Thermal Annealing (RTA) and Hydrogen plasma passivation an open circuit voltage of 570 mV for wafer based and 346 mV for seed layer based solar cells have been reached.

  10. Generation of electron Airy beams.

    Science.gov (United States)

    Voloch-Bloch, Noa; Lereah, Yossi; Lilach, Yigal; Gover, Avraham; Arie, Ady

    2013-02-21

    Within the framework of quantum mechanics, a unique particle wave packet exists in the form of the Airy function. Its counterintuitive properties are revealed as it propagates in time or space: the quantum probability wave packet preserves its shape despite dispersion or diffraction and propagates along a parabolic caustic trajectory, even though no force is applied. This does not contradict Newton's laws of motion, because the wave packet centroid propagates along a straight line. Nearly 30 years later, this wave packet, known as an accelerating Airy beam, was realized in the optical domain; later it was generalized to an orthogonal and complete family of beams that propagate along parabolic trajectories, as well as to beams that propagate along arbitrary convex trajectories. Here we report the experimental generation and observation of the Airy beams of free electrons. These electron Airy beams were generated by diffraction of electrons through a nanoscale hologram, which imprinted on the electrons' wavefunction a cubic phase modulation in the transverse plane. The highest-intensity lobes of the generated beams indeed followed parabolic trajectories. We directly observed a non-spreading electron wavefunction that self-heals, restoring its original shape after passing an obstacle. This holographic generation of electron Airy beams opens up new avenues for steering electronic wave packets like their photonic counterparts, because the wave packets can be imprinted with arbitrary shapes or trajectories.

  11. Surface modification of steels and magnesium alloy by high current pulsed electron beam

    Science.gov (United States)

    Hao, Shengzhi; Gao, Bo; Wu, Aimin; Zou, Jianxin; Qin, Ying; Dong, Chuang; An, Jian; Guan, Qingfeng

    2005-11-01

    High current pulsed electron beam (HCPEB) is now developing as a useful tool for surface modification of materials. When concentrated electron flux transferring its energy into a very thin surface layer within a short pulse time, superfast processes such as heating, melting, evaporation and consequent solidification, as well as dynamic stress induced may impart the surface layer with improved physico-chemical and mechanical properties. This paper presents our research work on surface modification of steels and magnesium alloy with HCPEB of working parameters as electron energy 27 keV, pulse duration ∼1 μs and energy density ∼2.2 J/cm2 per pulse. Investigations performed on carbon steel T8, mold steel D2 and magnesium alloy AZ91HP have shown that the most pronounced changes of phase-structure state and properties occurring in the near-surface layers, while the thickness of the modified layer with improved microhardness (several hundreds of micrometers) is significantly greater than that of the heat-affected zone. The formation mechanisms of surface cratering and non-stationary hardening effect in depth are discussed based on the elucidation of non-equilibrium temperature filed and different kinds of stresses formed during pulsed electron beam melting treatment. After the pulsed electron beam treatments, samples show significant improvements in measurements of wear and corrosion resistance.

  12. Surface modification of steels and magnesium alloy by high current pulsed electron beam

    International Nuclear Information System (INIS)

    Hao, Shengzhi; Gao, Bo; Wu, Aimin; Zou, Jianxin; Qin, Ying; Dong, Chuang; An, Jian; Guan, Qingfeng

    2005-01-01

    High current pulsed electron beam (HCPEB) is now developing as a useful tool for surface modification of materials. When concentrated electron flux transferring its energy into a very thin surface layer within a short pulse time, superfast processes such as heating, melting, evaporation and consequent solidification, as well as dynamic stress induced may impart the surface layer with improved physico-chemical and mechanical properties. This paper presents our research work on surface modification of steels and magnesium alloy with HCPEB of working parameters as electron energy 27 keV, pulse duration ∼1 μs and energy density ∼2.2 J/cm 2 per pulse. Investigations performed on carbon steel T8, mold steel D2 and magnesium alloy AZ91HP have shown that the most pronounced changes of phase-structure state and properties occurring in the near-surface layers, while the thickness of the modified layer with improved microhardness (several hundreds of micrometers) is significantly greater than that of the heat-affected zone. The formation mechanisms of surface cratering and non-stationary hardening effect in depth are discussed based on the elucidation of non-equilibrium temperature filed and different kinds of stresses formed during pulsed electron beam melting treatment. After the pulsed electron beam treatments, samples show significant improvements in measurements of wear and corrosion resistance

  13. Electron beam fabrication and characterization of high-resolution magnetic force microscopy tips

    Science.gov (United States)

    Rührig, M.; Porthun, S.; Lodder, J. C.; McVitie, S.; Heyderman, L. J.; Johnston, A. B.; Chapman, J. N.

    1996-03-01

    The stray field, magnetic microstructure, and switching behavior of high-resolution electron beam fabricated thin film tips for magnetic force microscopy (MFM) are investigated with different imaging modes in a transmission electron microscope (TEM). As the tiny smooth carbon needles covered with a thermally evaporated magnetic thin film are transparent to the electron energies used in these TEMs it is possible to observe both the external stray field emanating from the tips as well as their internal domain structure. The experiments confirm the basic features of electron beam fabricated thin film tips concluded from various MFM observations using these tips. Only a weak but highly concentrated stray field is observed emanating from the immediate apex region of the tip, consistent with their capability for high resolution. It also supports the negligible perturbation of the magnetization sample due to the tip stray field observed in MFM experiments. Investigation of the magnetization distributions within the tips, as well as preliminary magnetizing experiments, confirm a preferred single domain state of the high aspect ratio tips. To exclude artefacts of the observation techniques both nonmagnetic tips and those supporting different magnetization states are used for comparison.

  14. Improving the Characteristics of Sn-doped In{sub 2}O{sub 2} Grown at Room Temperature with Oxygen Radical-Assisted Electron Beam Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Oh, Min-Suk [Korea Institute of Industrial Technology, Gwangju (Korea, Republic of); Seo, Inseok [Chonbuk National University, Jeonju (Korea, Republic of)

    2017-07-15

    Sn-doped In{sub 2}O{sub 3} (Indium tin oxide, ITO) is widely utilized in numerous industrial applications due to its high electrical conductivity and high optical transmittance in the visible region. High quality ITO thin-films have been grown at room temperature by oxygen radical assisted e-beam evaporation without any post annealing or plasma treatment. The introduction of oxygen radicals during e-beam growth greatly improved the surface morphology and structural properties of the ITO films. The obtained ITO film exhibits higher carrier mobility of 43.2 cm{sup 2}/V·s and larger optical transmittance of 84.6%, resulting in a higher figure of merit of ∼ 2.8 × 10{sup −2} Ω{sup −1}, which are quite comparable to the ITO film deposited by conventional e-beam evaporation. These results show that ITO films grown by oxygen radical assisted e-beam evaporation at room temperature with high optical transmittance and high electron conductivity have a great potential for organic optoelectronic devices.

  15. Domino Platform: PVD Coaters for Arc Evaporation and High Current Pulsed Magnetron Sputtering

    International Nuclear Information System (INIS)

    Vetter, J; Müller, J; Erkens, G

    2012-01-01

    AlTiN and CrN coatings were deposited in hybrid DOMINO platforms by magnetron sputtering (DC-MS, DC-MS+HCP-MS, HCP-MS) and vacuum arc evaporation. The ion cleaning was done by the AEGD process. The coating rates and the energy efficiency of both deposition processes were compared. The roughness effects of the different coating types were discussed. Preliminary results of the change of pulse characteristics during simultaneously running of HCP-MS plus vacuum arc evaporation are shown.

  16. Mechanical properties of EB-PVD ZrO{sub 2} thermal barrier coatings; Mechanische Eigenschaften von EB-PVD ZrO{sub 2} Waermedaemmschichten

    Energy Technology Data Exchange (ETDEWEB)

    Held, Carolin

    2014-08-29

    In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

  17. Combined phenomena of beam-beam and beam-electron cloud interactionsin circular e^{+}e^{-} colliders

    Directory of Open Access Journals (Sweden)

    Kazuhito Ohmi

    2002-10-01

    Full Text Available An electron cloud causes various effects in high intensity positron storage rings. The positron beam and the electron cloud can be considered a typical two-stream system with a certain plasma frequency. Beam-beam interaction is another important effect for high luminosity circular colliders. Colliding two beams can be considered as a two-stream system with another plasma frequency. We study the combined phenomena of the beam-electron cloud and beam-beam interactions from a viewpoint of two complex two-stream effects with two plasma frequencies.

  18. Electron stimulated molecular desorption of a non-evaporable Zr-V-Fe alloy getter at room temperature

    CERN Document Server

    Le Pimpec, Frederic; Laurent, Jean Michel

    2002-01-01

    Electron stimulated molecular desorption (ESD) from a non-evaporable getters (NEG) St 707 registered trademark (SAES Getters trademark ) sample after conditioning and after saturation with isotopic carbon monoxide (cf. nomenclature in Handbook of Chemistry and Physics, CRC Press, 1994), **1**3C**1**8O, has been studied on a laboratory setup. Measurements were performed using an electron beam of 300 eV kinetic energy, with an average electron intensity of 1.6 multiplied by 10**1**5 electrons s**-**1. The electrons were impinging on the 15 cm **2 target surface at perpendicular incidence. It is found that the desorption yields eta (molecules/electron) of the characteristic gases in an UHV system (hydrogen, methane, water, carbon monoxide, carbon dioxide) for a fully activated NEG as well as for a NEG fully saturated with **1**3C**1**8O are lower than for OFHC copper baked at 120 degree C. A small fraction only of the gas which is required to saturate the getter surface can be re-desorbed and thus appears to be ...

  19. ANTIMONY INDUCED CRYSTALLIZATION OF AMORPHOUS SILICON

    Institute of Scientific and Technical Information of China (English)

    Y. Wang; H.Z. Li; C.N. Yu; G.M. Wu; I. Gordon; P. Schattschneider; O. Van Der Biest

    2007-01-01

    Antimony induced crystallization of PVD (physics vapor deposition) amorphous silicon can be observed on sapphire substrates. Very large crystalline regions up to several tens of micrometers can be formed. The Si diffraction patterns of the area of crystallization can be observed with TEM (transmission electron microscopy). Only a few and much smaller crystals of the order of 1μm were formed when the antimony layer was deposited by MBE(molecular beam epitaxy) compared with a layer formed by thermal evaporation. The use of high vacuum is essential in order to observe any Sb induced crystallization at all. In addition it is necessary to take measures to limit the evaporation of the antimony.

  20. PVD TBC experience on GE aircraft engines

    Science.gov (United States)

    Maricocchi, Antonio; Bartz, Andi; Wortman, David

    1995-01-01

    The higher performance levels of modern gas turbine engines present significant challenges in the reliability of materials in the turbine. The increased engine temperatures required to achieve the higher performance levels reduce the strength of the materials used in the turbine sections of the engine. Various forms of thermal barrier coatings (TBC's) have been used for many years to increase the reliability of gas turbine engine components. Recent experience with the physical vapor deposition (PVD) process using ceramic material has demonstrated success in extending the service life of turbine blades and nozzles. Engine test results of turbine components with a 125 micron (0.005 in) PVD TBC have demonstrated component operating temperatures of 56-83 C (100-150 F) lower than non-PVD TBC components. Engine testing has also revealed the TBC is susceptible to high angle particle impact damage. Sand particles and other engine debris impact the TBC surface at the leading edge of airfoils and fracture the PVD columns. As the impacting continues, the TBC erodes away in local areas. Analysis of the eroded areas has shown a slight increase in temperature over a fully coated area, however a significant temperature reduction was realized over an airfoil without TBC.

  1. Generation of Nondiffracting Electron Bessel Beams

    Directory of Open Access Journals (Sweden)

    Vincenzo Grillo

    2014-01-01

    Full Text Available Almost 30 years ago, Durnin discovered that an optical beam with a transverse intensity profile in the form of a Bessel function of the first order is immune to the effects of diffraction. Unlike most laser beams, which spread upon propagation, the transverse distribution of these Bessel beams remains constant. Electrons also obey a wave equation (the Schrödinger equation, and therefore Bessel beams also exist for electron waves. We generate an electron Bessel beam by diffracting electrons from a nanoscale phase hologram. The hologram imposes a conical phase structure on the electron wave-packet spectrum, thus transforming it into a conical superposition of infinite plane waves, that is, a Bessel beam. We verify experimentally that these beams can propagate for 0.6 m without measurable spreading and can also reconstruct their intensity distributions after being partially obstructed by an obstacle. Finally, we show by numerical calculations that the performance of an electron microscope can be increased dramatically through use of these beams.

  2. Investigation of Chirality Selection Mechanism of Single Walled Carbon Nanotube-3

    Science.gov (United States)

    2017-12-14

    termination. Fe ions were implanted into Al2O3 (10 nm) / SiO2 / Si wafer and then thin Fe film (1 nm) was deposited on the substrate by e-beam...for the growth of uniform and tall CNT forests. Introduction : The key lesson from the research of previous years’ is that maintaining the catalyst...catalyst preparation—physical vapor deposition (PVD) of a catalyst thin film on a substrate by thermal evaporation, e-beam evaporation, or sputtering

  3. Tribological and Wear Performance of Nanocomposite PVD Hard Coatings Deposited on Aluminum Die Casting Tool

    Directory of Open Access Journals (Sweden)

    Jose Mario Paiva

    2018-02-01

    Full Text Available In the aluminum die casting process, erosion, corrosion, soldering, and die sticking have a significant influence on tool life and product quality. A number of coatings such as TiN, CrN, and (Cr,AlN deposited by physical vapor deposition (PVD have been employed to act as protective coatings due to their high hardness and chemical stability. In this study, the wear performance of two nanocomposite AlTiN and AlCrN coatings with different structures were evaluated. These coatings were deposited on aluminum die casting mold tool substrates (AISI H13 hot work steel by PVD using pulsed cathodic arc evaporation, equipped with three lateral arc-rotating cathodes (LARC and one central rotating cathode (CERC. The research was performed in two stages: in the first stage, the outlined coatings were characterized regarding their chemical composition, morphology, and structure using glow discharge optical emission spectroscopy (GDOES, scanning electron microscopy (SEM, and X-ray diffraction (XRD, respectively. Surface morphology and mechanical properties were evaluated by atomic force microscopy (AFM and nanoindentation. The coating adhesion was studied using Mersedes test and scratch testing. During the second stage, industrial tests were carried out for coated die casting molds. In parallel, tribological tests were also performed in order to determine if a correlation between laboratory and industrial tests can be drawn. All of the results were compared with a benchmark monolayer AlCrN coating. The data obtained show that the best performance was achieved for the AlCrN/Si3N4 nanocomposite coating that displays an optimum combination of hardness, adhesion, soldering behavior, oxidation resistance, and stress state. These characteristics are essential for improving the die mold service life. Therefore, this coating emerges as a novelty to be used to protect aluminum die casting molds.

  4. Tribological and Wear Performance of Nanocomposite PVD Hard Coatings Deposited on Aluminum Die Casting Tool.

    Science.gov (United States)

    Paiva, Jose Mario; Fox-Rabinovich, German; Locks Junior, Edinei; Stolf, Pietro; Seid Ahmed, Yassmin; Matos Martins, Marcelo; Bork, Carlos; Veldhuis, Stephen

    2018-02-28

    In the aluminum die casting process, erosion, corrosion, soldering, and die sticking have a significant influence on tool life and product quality. A number of coatings such as TiN, CrN, and (Cr,Al)N deposited by physical vapor deposition (PVD) have been employed to act as protective coatings due to their high hardness and chemical stability. In this study, the wear performance of two nanocomposite AlTiN and AlCrN coatings with different structures were evaluated. These coatings were deposited on aluminum die casting mold tool substrates (AISI H13 hot work steel) by PVD using pulsed cathodic arc evaporation, equipped with three lateral arc-rotating cathodes (LARC) and one central rotating cathode (CERC). The research was performed in two stages: in the first stage, the outlined coatings were characterized regarding their chemical composition, morphology, and structure using glow discharge optical emission spectroscopy (GDOES), scanning electron microscopy (SEM), and X-ray diffraction (XRD), respectively. Surface morphology and mechanical properties were evaluated by atomic force microscopy (AFM) and nanoindentation. The coating adhesion was studied using Mersedes test and scratch testing. During the second stage, industrial tests were carried out for coated die casting molds. In parallel, tribological tests were also performed in order to determine if a correlation between laboratory and industrial tests can be drawn. All of the results were compared with a benchmark monolayer AlCrN coating. The data obtained show that the best performance was achieved for the AlCrN/Si₃N₄ nanocomposite coating that displays an optimum combination of hardness, adhesion, soldering behavior, oxidation resistance, and stress state. These characteristics are essential for improving the die mold service life. Therefore, this coating emerges as a novelty to be used to protect aluminum die casting molds.

  5. Performance of a dual-process PVD/PS tungsten coating structure under deuterium ion irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyunmyung; Lee, Ho Jung; Kim, Sung Hwan [Department of Nuclear and Quantum Engineering, KAIST, Daejeon (Korea, Republic of); Song, Jae-Min [Department of Nuclear Engineering, Seoul National University, Seoul (Korea, Republic of); Jang, Changheui, E-mail: chjang@kaist.ac.kr [Department of Nuclear and Quantum Engineering, KAIST, Daejeon (Korea, Republic of)

    2016-11-01

    Highlights: • D{sup +} irradiation performance of a dual-process PVD/PS W coating was evaluated. • Low-energy plasmas exposure of 100 eV D{sup +} with 1.17 × 10{sup 21} D/s{sup −1} m{sup 2} flux was applied. • After D ion irradiation, flakes were observed on the surface of the simple PS coating. • While, sub-μm size protrusions were observed for dual-process PVD/PS W coating. • Height of D spike in depth profile was lower for dual-process PVD/PS W coating. - Abstract: A dual-process coating structure was developed on a graphite substrate to improve the performance of the coating structure under anticipated operating condition of fusion devices. A thin multilayer W/Mo coating (6 μm) was deposited by physical vapor deposition (PVD) method with a variation of Mo interlayer thickness on plasma spray (PS) W coating (160 μm) of a graphite substrate panel. The dual-process PVD/PS W coatings then were exposed to 3.08 × 10{sup 24} D m{sup −2} of 100 eV D ions with a flux of 1.71 × 10{sup 21} D m{sup −2} s{sup −1} in an electron cyclotron resonance (ECR) chamber. After irradiation, surface morphology and D depth profiles of the dual-process coating were analyzed and compared to those of the simple PS W coating. Both changes in surface morphology and D retention were strongly dependent on the microstructure of surface coating. Meanwhile, the existence of Mo interlayer seemed to have no significant effect on the retention of deuterium.

  6. PEGDA/PVdF/F127 gel type polymer electrolyte membranes for lithium secondary batteries

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Yan-Jie; Kim, Dukjoon [Department of Chemical Engineering, Polymer Technology Institute, Sungkyunkwan University, Suwon, Kyunggi 440-746 (Korea)

    2007-03-30

    A novel porous gel polymer electrolyte (GPE) membrane based on poly(ethylene glycol) diacrylate (PEGDA), poly(vinylidene fluoride) (PVdF), and polyethylene oxide-co-polypropylene oxide-co-polyethylene oxide (PEO-PPO-PEO, F127) was fabricated by a phase inversion technique. The PEGDA cross-linking oligomer could be randomly mixed with unraveled PVdF polymer chains to form the interpenetrating polymer network (IPN) structure. Several experimental techniques including infrared (IR) spectra, differential scanning calorimetry (DSC), thermogravimetric analyzer (TGA), scanning electron microscopy (SEM), electrochemical impedance spectroscopy (EIS) and potentiostat/galvanostat were employed to investigate the characteristics of the polymer membranes. PEGDA and F127 influenced the porous size and structure. The mechanical strength and flexibility of the membrane were controlled by its composition. The membrane with the composition of PEGDA/PVdF/F127 (0/4/4) showed the highest electrolyte uptake of 152.6% and the maximum ionic conductivity of 2.0 x 10{sup -3} S cm{sup -1} at room temperature. All GPEs prepared in this study were electrochemically stable up to 4.5 V. (author)

  7. Surface coatings deposited by CVD and PVD

    International Nuclear Information System (INIS)

    Gabriel, H.M.

    1982-01-01

    The demand for wear and corrosion protective coatings is increasing due to economic facts. Deposition processes in gas atmospheres like the CVD and PVD processes attained a tremendous importance especially in the field of the deposition of thin hard refractory and ceramic coatings. CVD and PVD processes are reviewed in detail. Some examples of coating installations are shown and numerous applications are given to demonstrate the present state of the art. (orig.) [de

  8. Electron beam-plasma interaction and electron-acoustic solitary waves in a plasma with suprathermal electrons

    Science.gov (United States)

    Danehkar, A.

    2018-06-01

    Suprathermal electrons and inertial drifting electrons, so called electron beam, are crucial to the nonlinear dynamics of electrostatic solitary waves observed in several astrophysical plasmas. In this paper, the propagation of electron-acoustic solitary waves (EAWs) is investigated in a collisionless, unmagnetized plasma consisting of cool inertial background electrons, hot suprathermal electrons (modeled by a κ-type distribution), and stationary ions. The plasma is penetrated by a cool electron beam component. A linear dispersion relation is derived to describe small-amplitude wave structures that shows a weak dependence of the phase speed on the electron beam velocity and density. A (Sagdeev-type) pseudopotential approach is employed to obtain the existence domain of large-amplitude solitary waves, and investigate how their nonlinear structures depend on the kinematic and physical properties of the electron beam and the suprathermality (described by κ) of the hot electrons. The results indicate that the electron beam can largely alter the EAWs, but can only produce negative polarity solitary waves in this model. While the electron beam co-propagates with the solitary waves, the soliton existence domain (Mach number range) becomes narrower (nearly down to nil) with increasing the beam speed and the beam-to-hot electron temperature ratio, and decreasing the beam-to-cool electron density ratio in high suprathermality (low κ). It is found that the electric potential amplitude largely declines with increasing the beam speed and the beam-to-cool electron density ratio for co-propagating solitary waves, but is slightly decreased by raising the beam-to-hot electron temperature ratio.

  9. Application of electron beam irradiation. 4. Treatment of pollutants by electron beam irradiation

    International Nuclear Information System (INIS)

    Tokunaga, Okihiro; Arai, Hidehiko

    1994-01-01

    Electron beam irradiation is capable of dissolving and removing pollutants, such as sulfur oxides, nitrogen oxides, and organic compounds, by easy production of OH radicals in flue gas and water. This paper deals with current status in the search for techniques for treating flue gas and waste water, using electron beam irradiation. Pilot tests have been conducted during the period 1991-1994 for the treatment of flue gas caused by coal and garbage burning and road tunnels. Firstly, techniques for cleaning flue gas with electron beams are outlined, with special reference to their characteristics and process of research development. Secondly, the application of electron beam irradiation in the treatment of waste water is described in terms of the following: (1) disinfection of sewage, (2) cleaning of water polluted with toxic organic compounds, (3) treatment for eliminating sewage sludge, (4) promotion of sewage sludge sedimentation, (5) disinfection and composting of sewage sludge, and (6) regeneration of activated carbon used for the treatment of waste water. (N.K.)

  10. The Two-Beam Free Electron Laser Oscillator

    CERN Document Server

    Thompson, Neil R

    2004-01-01

    A one-dimensional model of a free-electron laser operating simultaneously with two electron beams of different energies [1] is extended to an oscillator configuration. The electron beam energies are chosen so that an harmonic of the lower energy beam is at the fundamental radiation wavelength of the higher energy beam. Potential benefits over a single-beam free-electron laser oscillator are discussed.

  11. High-brightness electron beam diagnostics at the ATF

    International Nuclear Information System (INIS)

    Wang, X.J.; Ben-Zvi, I.

    1996-01-01

    The Brookhaven Accelerator Test Facility (ATF) is a dedicated user facility for accelerator physicists. Its design is optimized to explore laser acceleration and coherent radiation production. To characterize the low-emittance, picoseconds long electron beam produced by the ATF's photocathode RF gun, we have installed electron beam profile monitors for transverse emittance measurement, and developed a new technique to measure electron beam pulse length by chirping the electron beam energy. We have also developed a new technique to measure the ps slice emittance of a 10 ps long electron beam. Stripline beam position monitors were installed along the beam to monitor the electron beam position and intensity. A stripline beam position monitor was also used to monitor the timing jitter between the RF system and laser pulses. Transition radiation was used to measure electron beam energy, beam profile and electron beam bunch length

  12. Electron beam treatment of industrial wastewater

    International Nuclear Information System (INIS)

    Han, Bumsoo; Kim, JinKyu; Kim, Yuri

    2004-01-01

    For industrial wastewater with low impurity levels such as contaminated ground water, cleaning water and etc., purification only with electron beam is possible, but it should be managed carefully with reducing required irradiation doses as low as possible. Also for industrial wastewater with high impurity levels such as dyeing wastewater, leachate and etc., purification only with electron beam requires high amount of doses and far beyond economies. Electron beam treatment combined with conventional purification methods such as coagulation, biological treatment, etc. is suitable for reduction of non-biodegradable impurities in wastewater and will extend the application area of electron beam. A pilot plant with electron beam for treating 1,000 m 3 /day of wastewater from dyeing industries has constructed and operated continuously since Oct 1998. Electron beam irradiation instead of chemical treatment shows much improvement in removing impurities and increases the efficiency of biological treatment. Actual plant is under consideration based upon the experimental results. (author)

  13. 'Electron compression' of beam-beam footprint in the Tevatron

    International Nuclear Information System (INIS)

    Shiltsev, V.; Finley, D.A.

    1997-08-01

    The beam-beam interaction in the Tevatron collider sets some limits on bunch intensity and luminosity. These limits are caused by a tune spread in each bunch which is mostly due to head-on collisions, but there is also a bunch-to-bunch tune spread due to parasitic collisions in multibunch operation. We describe a counter-traveling electron beam which can be used to eliminate these effects, and present general considerations and physics limitations of such a device which provides 'electron compression' of the beam-beam footprint in the Tevatron

  14. Development of high current electron beam generator

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Byeong Cheol; Lee, Jong Min; Kim, Sun Kook [and others

    1997-05-01

    A high-current electron beam generator has been developed. The energy and the average current of the electron beam are 2 MeV and 50 mA, respectively. The electron beam generator is composed of an electron gun, RF acceleration cavities, a 260-kW RF generator, electron beam optics components, and control system, etc. The electron beam generator will be used for the development of a millimeter-wave free-electron laser and a high average power infrared free-electron laser. The machine will also be used as a user facility in nuclear industry, environment industry, semiconductor industry, chemical industry, etc. (author). 15 tabs., 85 figs.

  15. Development of high current electron beam generator

    International Nuclear Information System (INIS)

    Lee, Byeong Cheol; Lee, Jong Min; Kim, Sun Kook

    1997-05-01

    A high-current electron beam generator has been developed. The energy and the average current of the electron beam are 2 MeV and 50 mA, respectively. The electron beam generator is composed of an electron gun, RF acceleration cavities, a 260-kW RF generator, electron beam optics components, and control system, etc. The electron beam generator will be used for the development of a millimeter-wave free-electron laser and a high average power infrared free-electron laser. The machine will also be used as a user facility in nuclear industry, environment industry, semiconductor industry, chemical industry, etc. (author). 15 tabs., 85 figs

  16. Cornell electron beam ion source

    International Nuclear Information System (INIS)

    Kostroun, V.O.; Ghanbari, E.; Beebe, E.N.; Janson, S.W.

    1981-01-01

    An electron beam ion source (EBIS) for the production of low energy, multiply charged ion beams to be used in atomic physics experiments has been designed and constructed. An external high perveance electron gun is used to launch the electron beam into a conventional solenoid. Novel features of the design include a distributed sputter ion pump to create the ultrahigh vacuum environment in the ionization region of the source and microprocessor control of the axial trap voltage supplies

  17. Electron beam based transversal profile measurements of intense ion beams

    International Nuclear Information System (INIS)

    El Moussati, Said

    2014-01-01

    A non-invasive diagnostic method for the experimental determination of the transverse profile of an intense ion beam has been developed and investigated theoretically as well as experimentally within the framework of the present work. The method is based on the deflection of electrons when passing the electromagnetic field of an ion beam. To achieve this an electron beam is employed with a specifically prepared transversal profile. This distinguish this method from similar ones which use thin electron beams for scanning the electromagnetic field [Roy et al. 2005; Blockland10]. The diagnostic method presented in this work will be subsequently called ''Electron-Beam-Imaging'' (EBI). First of all the influence of the electromagnetic field of the ion beam on the electrons has been theoretically analyzed. It was found that the magnetic field causes only a shift of the electrons along the ion beam axis, while the electric field only causes a shift in a plane transverse to the ion beam. Moreover, in the non-relativistic case the magnetic force is significantly smaller than the Coulomb one and the electrons suffer due to the magnetic field just a shift and continue to move parallel to their initial trajectory. Under the influence of the electric field, the electrons move away from the ion beam axis, their resulting trajectory shows a specific angle compared to the original direction. This deflection angle practically depends just on the electric field of the ion beam. Thus the magnetic field has been neglected when analysing the experimental data. The theoretical model provides a relationship between the deflection angle of the electrons and the charge distribution in the cross section of the ion beam. The model however only can be applied for small deflection angles. This implies a relationship between the line-charge density of the ion beam and the initial kinetic energy of the electrons. Numerical investigations have been carried out to clarify the

  18. Low voltage electron beam accelerators

    International Nuclear Information System (INIS)

    Ochi, Masafumi

    2003-01-01

    Widely used electron accelerators in industries are the electron beams with acceleration voltage at 300 kV or less. The typical examples are shown on manufactures in Japan, equipment configuration, operation, determination of process parameters, and basic maintenance requirement of the electron beam processors. New electron beam processors with acceleration voltage around 100 kV were introduced maintaining the relatively high dose speed capability of around 10,000 kGy x mpm at production by ESI (Energy Science Inc. USA, Iwasaki Electric Group). The application field like printing and coating for packaging requires treating thickness of 30 micron or less. It does not require high voltage over 110 kV. Also recently developed is a miniature bulb type electron beam tube with energy less than 60 kV. The new application area for this new electron beam tube is being searched. The drive force of this technology to spread in the industries would be further development of new application, process and market as well as the price reduction of the equipment, upon which further acknowledgement and acceptance of the technology to societies and industries would entirely depend. (Y. Tanaka)

  19. Low voltage electron beam accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Ochi, Masafumi [Iwasaki Electric Co., Ltd., Tokyo (Japan)

    2003-02-01

    Widely used electron accelerators in industries are the electron beams with acceleration voltage at 300 kV or less. The typical examples are shown on manufactures in Japan, equipment configuration, operation, determination of process parameters, and basic maintenance requirement of the electron beam processors. New electron beam processors with acceleration voltage around 100 kV were introduced maintaining the relatively high dose speed capability of around 10,000 kGy x mpm at production by ESI (Energy Science Inc. USA, Iwasaki Electric Group). The application field like printing and coating for packaging requires treating thickness of 30 micron or less. It does not require high voltage over 110 kV. Also recently developed is a miniature bulb type electron beam tube with energy less than 60 kV. The new application area for this new electron beam tube is being searched. The drive force of this technology to spread in the industries would be further development of new application, process and market as well as the price reduction of the equipment, upon which further acknowledgement and acceptance of the technology to societies and industries would entirely depend. (Y. Tanaka)

  20. Feasibility study for mega-electron-volt electron beam tomography.

    Science.gov (United States)

    Hampel, U; Bärtling, Y; Hoppe, D; Kuksanov, N; Fadeev, S; Salimov, R

    2012-09-01

    Electron beam tomography is a promising imaging modality for the study of fast technical processes. But for many technical objects of interest x rays of several hundreds of keV energy are required to achieve sufficient material penetration. In this article we report on a feasibility study for fast electron beam computed tomography with a 1 MeV electron beam. The experimental setup comprises an electrostatic accelerator with beam optics, transmission target, and a single x-ray detector. We employed an inverse fan-beam tomography approach with radiographic projections being generated from the linearly moving x-ray source. Angular projections were obtained by rotating the object.

  1. The effect of MEVVA ion implantation on the tribological properties of PVD-TiN films

    International Nuclear Information System (INIS)

    Manory, R.; Mollica, S.

    1998-01-01

    The present work is the first study in which the effects of metal evaporation vacuum (MEVVA) implantation are studied on TiN of the PVD type which is commercially available in Australia. The MEVVA ion implanter differs from the 'conventional' type of ion implanter in the fact that it has a high throughput of metal ions which are not mass analysed and therefore has more potential for industrial non-electronic applications. TiN-coated steel samples have been implanted with two types of species - one light and one heavy - C + and W + respectively. The samples were analysed by Rutherford backscattering (RBS) and x-ray diffraction (XRD). The tribological performance was assessed by pin-on-disc and microhardness. The results show that carbon implantation was very effective in improving the friction coefficient by the formation of a carbonaceous layer on the surface. XRD also shows formation of TiC in the near surface region. W implantation does not improve the friction coefficient but improves the lifetime of the coating. Unimplanted films fail in the pin-on-disk test after 7000 cycles, whereas implanted films are still well adhered after 18000 cycles

  2. METHOD OF ELECTRON BEAM PROCESSING

    DEFF Research Database (Denmark)

    2003-01-01

    As a rule, electron beam welding takes place in a vacuum. However, this means that the workpieces in question have to be placed in a vacuum chamber and have to be removed therefrom after welding. This is time−consuming and a serious limitation of a process the greatest advantage of which is the o......As a rule, electron beam welding takes place in a vacuum. However, this means that the workpieces in question have to be placed in a vacuum chamber and have to be removed therefrom after welding. This is time−consuming and a serious limitation of a process the greatest advantage of which...... is the option of welding workpieces of large thicknesses. Therefore the idea is to guide the electron beam (2) to the workpiece via a hollow wire, said wire thereby acting as a prolongation of the vacuum chamber (4) down to workpiece. Thus, a workpiece need not be placed inside the vacuum chamber, thereby...... exploiting the potential of electron beam processing to a greater degree than previously possible, for example by means of electron beam welding...

  3. Attainment of Electron Beam Suitable for Medium Energy Electron Cooling

    Energy Technology Data Exchange (ETDEWEB)

    Seletskiy, Sergei M. [Univ. of Rochester, NY (United States)

    2005-01-01

    Electron cooling of charged particle beams is a well-established technique at electron energies of up to 300 keV. However, up to the present time the advance of electron cooling to the MeV-range energies has remained a purely theoretical possibility. The electron cooling project at Fermilab has recently demonstrated the ¯rst cooling of 8.9 GeV/c antiprotons in the Recycler ring, and therefore, has proved the validity of the idea of relativistic electron cool- ing. The Recycler Electron Cooler (REC) is the key component of the Teva- tron Run II luminosity upgrade project. Its performance depends critically on the quality of electron beam. A stable electron beam of 4.3 MeV car- rying 0.5 A of DC current is required. The beam suitable for the Recycler Electron Cooler must have an angular spread not exceeding 200 ¹rad. The full-scale prototype of the REC was designed, built and tested at Fermilab in the Wideband laboratory to study the feasibility of attaining the high-quality electron beam. In this thesis I describe various aspects of development of the Fermilab electron cooling system, and the techniques used to obtain the electron beam suitable for the cooling process. In particular I emphasize those aspects of the work for which I was principally responsible.

  4. Electron backscattering for process control in electron beam welding

    International Nuclear Information System (INIS)

    Ardenne, T. von; Panzer, S.

    1983-01-01

    A number of solutions to the automation of electron beam welding is presented. On the basis of electron backscattering a complex system of process control has been developed. It allows an enlarged imaging of the material's surface, improved adjustment of the beam focusing and definite focus positioning. Furthermore, both manual and automated positioning of the electron beam before and during the welding process has become possible. Monitoring of the welding process for meeting standard welding requirements can be achieved with the aid of a control quantity derived from the results of electronic evaluation of the high-frequency electron backscattering

  5. Corrosion behaviour of Arc-PVD coatings and hybrid systems

    International Nuclear Information System (INIS)

    Reichel, K.

    1992-01-01

    To achieve a comprehensive protective effect against corrosion and wear stresses, coating systems are increasingly being developed, in which there is a separation of the tasks of the coating materials regarding the protective effect. On the one hand, pure PVD coating systems are used, on the other hand hybrid coatings are examined, where galvanic processes are combined with PVD technique. The results of experiments introduced in this article were determined on Arc-PVD coatings. By this process, titanium nitride and chromium nitride coatings are both deposited directly on the basic material and are also deposited as combination coatings of Ti/TiN and chemical nickel/TiN. (orig.) [de

  6. Beam conditioner for free electron lasers and synchrotrons

    International Nuclear Information System (INIS)

    Liu, H.; Neil, G.R.

    1998-01-01

    A focused optical has been used to introduce an optical pulse, or electromagnetic wave, collinear with the electron beam in a free electron laser or synchrotron thereby adding an axial field component that accelerates the electrons on the radial outside of the distribution of electrons in the electron beam. This invention consists of using the axial electrical component of a TEM 10 mode Gaussian beam in vacuum to condition the electron beam and speed up the outer electrons in the beam. The conditioning beam should possess about the same diameter as the electron beam. The beam waist of the conditioning wave must be located around the entrance of the undulator longitudinally to have a net energy exchange between the electrons in the outer part of the distribution and the conditioning wave owing to the natural divergence of a Gaussian beam. By accelerating the outer electrons, the outer and core electrons are caused to stay in phase. This increases the fraction of the electron beam energy that is converted to light thereby improving the efficiency of conversion of energy to light and therefore boosting the power output of the free electron laser and synchrotron. 4 figs

  7. Surface characteristics of hydroxyapatite-coated layer prepared on nanotubular Ti–35Ta–xHf alloys by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Jeong, Yong-Hoon [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Moon, Byung-Hak [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Restorative, Prosthetic and Primary Care Dentistry, College of Dentistry, The Ohio State University, Columbus, OH (United States)

    2013-12-31

    In this study, we investigated the surface characteristics of hydroxyapatite (HA)-coated layers prepared by electron-beam physical vapor deposition (EB-PVD) on nanotubular Ti–35Ta–xHf alloys (x = 3, 7, and 15 wt.%). Ti–35Ta–xHf alloys were first prepared by arc melting. Formation of a nanotube structure on these alloys was achieved by an electrochemical method in 1 M H{sub 3}PO{sub 4} + 0.8 wt.% NaF electrolytes. The HA coatings were then deposited on the nanotubular surface by an EB-PVD method. The surface characteristics were analyzed by field-emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray diffraction (XRD). The electrochemical behavior was examined using a potentiodynamic polarization test in 0.9% NaCl solution. The Ti–35Ta–xHf alloys had an equiaxed grain structure with α″ + β phases, and the α″ phase disappeared with increases in Hf content. The Ti–35Ta–15Hf alloy showed higher β-phase peak intensity in the XRD patterns than that for the lower Hf-content alloys. A highly ordered nanotubular oxide layer was formed on the Ti–35Ta–15Hf alloy, and the tube length depended on Hf content. The HA coating surface formed at traces of the nanotubular titanium oxide layer and completely covered the tips of the nanotubes with a cluster shape. From the potentiodynamic polarization tests, the incorporation of Hf element and formation of the nanotubular structure were the main factors for achieving lower current density. In particular, the surface of the HA coating on the nanotubular structure exhibited higher corrosion resistance than that of the nanotubular titanium oxide structure without an HA coating. - Highlights: • Hydroxyapatite (HA) was coated on nanotubular Ti–35Ta–xHf alloys, using EB-PVD. • Increasing the Hf content reduced the relative proportion of α″ martensite to β-Ti in the microstructures. • The detailed nanotubular structure formed by anodization depended on alloy composition

  8. Surface characteristics of hydroxyapatite-coated layer prepared on nanotubular Ti–35Ta–xHf alloys by EB-PVD

    International Nuclear Information System (INIS)

    Jeong, Yong-Hoon; Moon, Byung-Hak; Choe, Han-Cheol; Brantley, William A.

    2013-01-01

    In this study, we investigated the surface characteristics of hydroxyapatite (HA)-coated layers prepared by electron-beam physical vapor deposition (EB-PVD) on nanotubular Ti–35Ta–xHf alloys (x = 3, 7, and 15 wt.%). Ti–35Ta–xHf alloys were first prepared by arc melting. Formation of a nanotube structure on these alloys was achieved by an electrochemical method in 1 M H 3 PO 4 + 0.8 wt.% NaF electrolytes. The HA coatings were then deposited on the nanotubular surface by an EB-PVD method. The surface characteristics were analyzed by field-emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray diffraction (XRD). The electrochemical behavior was examined using a potentiodynamic polarization test in 0.9% NaCl solution. The Ti–35Ta–xHf alloys had an equiaxed grain structure with α″ + β phases, and the α″ phase disappeared with increases in Hf content. The Ti–35Ta–15Hf alloy showed higher β-phase peak intensity in the XRD patterns than that for the lower Hf-content alloys. A highly ordered nanotubular oxide layer was formed on the Ti–35Ta–15Hf alloy, and the tube length depended on Hf content. The HA coating surface formed at traces of the nanotubular titanium oxide layer and completely covered the tips of the nanotubes with a cluster shape. From the potentiodynamic polarization tests, the incorporation of Hf element and formation of the nanotubular structure were the main factors for achieving lower current density. In particular, the surface of the HA coating on the nanotubular structure exhibited higher corrosion resistance than that of the nanotubular titanium oxide structure without an HA coating. - Highlights: • Hydroxyapatite (HA) was coated on nanotubular Ti–35Ta–xHf alloys, using EB-PVD. • Increasing the Hf content reduced the relative proportion of α″ martensite to β-Ti in the microstructures. • The detailed nanotubular structure formed by anodization depended on alloy composition. • The

  9. Characterisation of Pristine and Recoated electron beam evaporation plasma-assisted physical vapour deposition Cr-N coatings on AISI M2 steel and WC-Co substrates

    International Nuclear Information System (INIS)

    Avelar-Batista, J.C.; Spain, E.; Housden, J.; Fuentes, G.G.; Rebole, R.; Rodriguez, R.; Montala, F.; Carreras, L.J.; Tate, T.J.

    2005-01-01

    This paper is focussed on the characterisation of electron beam evaporation plasma-assisted physical vapour deposition Cr-N coatings deposited on AISI M2 steel and hardmetal (K10) substrates in two different conditions: Pristine (i.e., coated) and Recoated (i.e., stripped and recoated). Analytical methods, including X-ray diffraction (XRD), scanning electron microscopy, scratch adhesion and pin-on-disc tests were used to evaluate several coating properties. XRD analyses indicated that both Pristine and Recoated coatings consisted of a mixture of hexagonal Cr 2 N and cubic CrN, regardless of substrate type. For the M2 steel substrate, only small differences were found in terms of coating phases, microstructure, adhesion, friction and wear coefficients between Pristine and Recoated. Recoated on WC-Co (K10) exhibited a less dense microstructure and significant inferior adhesion compared to Pristine on WC-Co (K10). The wear coefficient of Recoated on WC-Co was 100 times higher than those exhibited by all other specimens. The results obtained confirm that the stripping process did not adversely affect the Cr-N properties when this coating was deposited onto M2 steel substrates, but it is clear from the unsatisfactory tribological performance of Recoated on WC-Co that the stripping process is unsuitable for hardmetal substrates

  10. Improvement in ductility of high strength polycrystalline Ni-rich Ni{sub 3}Al alloy produced by EB-PVD

    Energy Technology Data Exchange (ETDEWEB)

    Sun, J.Y.; Pei, Y.L.; Li, S.S.; Zhang, H.; Gong, S.K., E-mail: gongsk@buaa.edu.cn

    2014-11-25

    Highlights: • High strength and high ductility of polycrystalline Ni-rich Ni{sub 3}Al alloy sheets were produced. • The elongation could be enhanced from ∼0.5% to ∼14.6% by microstructural control. • The fracture strength (∼820 MPa) was enhanced by the precipitation strengthening. • This work provides a general processing for repairing the worn single crystal blades. - Abstract: A 300 μm Ni-rich Ni{sub 3}Al sheet was produced by electron beam physical vapor deposition (EB-PVD) and followed by different heat treatments to obtain fine γ′/γ two-phase structures with large elongation. Tensile testing was performed at room-temperature, and the corresponding mechanisms were investigated in detail. Results indicated that the as-deposited Ni{sub 3}Al alloy exhibited non-equilibrium directional columnar crystal, and transited to equiaxed crystal with uniformly distributed tough γ phase after heat treatment. Meanwhile, the fracture mechanism transited from brittleness to a mixture of ductility and brittleness modes. With an appropriate heat treatment, high strength (ultimate tensile strength obtained 828 MPa) and high ductility (elongation obtained 14.6%) Ni{sub 3}Al alloy has been achieved, which was due to the mesh network microstructure. A series of transmission electron microscope (TEM) characterizations confirmed that the increasing flow stress of Ni{sub 3}Al alloy was attributed to the cubical secondary γ′ phase precipitates (25–50 nm) within the γ phase. This work provides a potential strategy for repairing the worn tip of single crystal engine blades using Ni-rich Ni{sub 3}Al alloy by EB-PVD.

  11. Multilayer stacks obtained by ion assisted EB PVD aimed at thermal barrier coating

    Energy Technology Data Exchange (ETDEWEB)

    Roos, E.; Maile, K.; Lyutovich, A. [Stuttgart Univ. (DE). Materialpruefungsanstalt (MPA)

    2010-07-01

    Thermal Barrier Coating (TBC) using Electron Beam Physical Vapour Deposition (EB PVD) is widely implemented, especially for aero-engine turbine blades. Generally, multilayer stacks are used for these aims. For the additional improvement of intermediate layers with graded transitions to the initial Ni-based alloy, the use of accelerated ions in the EBPVD-process is advantageous. The effect of the substrate bias potential, ion current density and deposition temperature on the structure and properties of Ti and Zr intermediate layers are investigated. The morphology of the films is studied using optical microscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM). It is found that the surface morphology becomes smoother with rising bias potential and decreasing ion current density. Measurements of Vicker's micro-hardness performed on these coatings have shown its increase with higher values of the bias and its reduction with the growing temperature. This effect is caused by the observed decrease in grain size and higher porosity of the films. A multilayer coating system Ni (based substrate)-Si-Si{sub x}Al{sub y}-Al with graded transitions between the layers is obtained using ion assisted EBPVD. Architecture of a multilayer stack for TBC with graded transitions is proposed. (orig.)

  12. Device for electron beam machining

    International Nuclear Information System (INIS)

    Panzer, S.; Ardenne, T. von; Liebergeld, H.

    1984-01-01

    The invention concerns a device for electron beam machining, in particular welding. It is aimed at continuous operation of the electron irradiation device. This is achieved by combining the electron gun with a beam guiding chamber, to which vacuum chambers are connected. The working parts to be welded can be arranged in the latter

  13. Angular-momentum-dominated electron beams and flat-beam generation

    International Nuclear Information System (INIS)

    Sun, Yin-e

    2005-01-01

    In the absence of external forces, if the dynamics within an electron beam is dominated by its angular momentum rather than other effects such as random thermal motion or self Coulomb-repulsive force (i.e., space-charge force), the beam is said to be angular-momentum-dominated. Such a beam can be directly applied to the field of electron-cooling of heavy ions; or it can be manipulated into an electron beam with large transverse emittance ratio, i.e., a flat beam. A flat beam is of interest for high-energy electron-positron colliders or accelerator-based light sources. An angular-momentum-dominated beam is generated at the Fermilab/NICADD photoinjector Laboratory (FNPL) and is accelerated to an energy of 16 MeV. The properties of such a beam is investigated systematically in experiment. The experimental results are in very good agreement with analytical expectations and simulation results. This lays a good foundation for the transformation of an angular-momentum-dominated beam into a flat beam. The round-to-flat beam transformer is composed of three skew quadrupoles. Based on a good knowledge of the angular-momentum-dominated beam, the quadrupoles are set to the proper strengths in order to apply a total torque which removes the angular momentum, resulting in a flat beam. For bunch charge around 0.5 nC, an emittance ratio of 100 ± 5 was measured, with the smaller normalized root-mean-square emittance around 0.4 mm-mrad. Effects limiting the flat-beam emittance ratio are investigated, such as the chromatic effects in the round-to-flat beam transformer, asymmetry in the initial angular-momentum-dominated beam, and space-charge effects. The most important limiting factor turns out to be the uncorrelated emittance growth caused by space charge when the beam energy is low, for example, in the rf gun area. As a result of such emittance growth prior to the round-to-flat beam transformer, the emittance ratio achievable in simulation decreases from orders of thousands to

  14. Angular-momentum-dominated electron beams and flat-beam generation

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Yin-e [Univ. of Chicago, IL (United States)

    2005-06-01

    In the absence of external forces, if the dynamics within an electron beam is dominated by its angular momentum rather than other effects such as random thermal motion or self Coulomb-repulsive force (i.e., space-charge force), the beam is said to be angular-momentum-dominated. Such a beam can be directly applied to the field of electron-cooling of heavy ions; or it can be manipulated into an electron beam with large transverse emittance ratio, i.e., a flat beam. A flat beam is of interest for high-energy electron-positron colliders or accelerator-based light sources. An angular-momentum-dominated beam is generated at the Fermilab/NICADD photoinjector Laboratory (FNPL) and is accelerated to an energy of 16 MeV. The properties of such a beam is investigated systematically in experiment. The experimental results are in very good agreement with analytical expectations and simulation results. This lays a good foundation for the transformation of an angular-momentum-dominated beam into a flat beam. The round-to-flat beam transformer is composed of three skew quadrupoles. Based on a good knowledge of the angular-momentum-dominated beam, the quadrupoles are set to the proper strengths in order to apply a total torque which removes the angular momentum, resulting in a flat beam. For bunch charge around 0.5 nC, an emittance ratio of 100 ± 5 was measured, with the smaller normalized root-mean-square emittance around 0.4 mm-mrad. Effects limiting the flat-beam emittance ratio are investigated, such as the chromatic effects in the round-to-flat beam transformer, asymmetry in the initial angular-momentum-dominated beam, and space-charge effects. The most important limiting factor turns out to be the uncorrelated emittance growth caused by space charge when the beam energy is low, for example, in the rf gun area. As a result of such emittance growth prior to the round-to-flat beam transformer, the emittance ratio achievable in simulation decreases from orders of thousands to

  15. Electron beam emission and interaction of double-beam gyrotron

    International Nuclear Information System (INIS)

    Singh, Udaybir; Kumar, Anil; Kumar, Nitin; Kumar, Narendra; Pratap, Bhanu; Purohit, L.P.; Sinha, A.K.

    2012-01-01

    Highlights: ► The complete electrical design of electron gun and interaction structure of double-beam gyrotron. ► EGUN code is used for the simulation of electron gun of double-beam gyrotron. ► MAGIC code is used for the simulation of interaction structure of double-beam gyrotron. ► Design validations with other codes. - Abstract: This paper presents the numerical simulation of a double-beam magnetron injection gun (DB-MIG) and beam-wave interaction for 60 GHz, 500 kW gyrotron. The beam-wave interaction calculations, power and frequency growth estimation are performed by using PIC code MAGIC. The maximum output power of 510 kW at 41.5% efficiency, beam currents of 6 A and 12 A, electron beam velocity ratios of 1.41 and 1.25 and beam voltage of 69 kV are estimated. To obtain the design parameters, the DB-MIG with maximum transverse velocity spread less than 5% is designed. The computer simulations are performed by using the commercially available code EGUN and the in-house developed code MIGANS. The simulated results of DB-MIG design obtained by using the EGUN code are also validated with another trajectory code TRAK, which are in good agreement.

  16. Electron beam emission and interaction of double-beam gyrotron

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Udaybir, E-mail: uday.ceeri@gmail.com [Gyrotron Laboratory, Microwave Tube Area, Central Electronics Engineering Research Institute (CEERI), Council of Scientific and Industrial Research (CSIR), Pilani, Rajasthan 333031 (India); Department of Physics, Gurukul Kangri University, Haridwar 249404 (India); Kumar, Anil [Gyrotron Laboratory, Microwave Tube Area, Central Electronics Engineering Research Institute (CEERI), Council of Scientific and Industrial Research (CSIR), Pilani, Rajasthan 333031 (India); Kumar, Nitin, E-mail: nitin_physika@rediffmail.com [Gyrotron Laboratory, Microwave Tube Area, Central Electronics Engineering Research Institute (CEERI), Council of Scientific and Industrial Research (CSIR), Pilani, Rajasthan 333031 (India); Kumar, Narendra; Pratap, Bhanu [Gyrotron Laboratory, Microwave Tube Area, Central Electronics Engineering Research Institute (CEERI), Council of Scientific and Industrial Research (CSIR), Pilani, Rajasthan 333031 (India); Purohit, L.P. [Department of Physics, Gurukul Kangri University, Haridwar 249404 (India); Sinha, A.K., E-mail: aksinha@ceeri.ernet.in [Gyrotron Laboratory, Microwave Tube Area, Central Electronics Engineering Research Institute (CEERI), Council of Scientific and Industrial Research (CSIR), Pilani, Rajasthan 333031 (India)

    2012-09-15

    Highlights: Black-Right-Pointing-Pointer The complete electrical design of electron gun and interaction structure of double-beam gyrotron. Black-Right-Pointing-Pointer EGUN code is used for the simulation of electron gun of double-beam gyrotron. Black-Right-Pointing-Pointer MAGIC code is used for the simulation of interaction structure of double-beam gyrotron. Black-Right-Pointing-Pointer Design validations with other codes. - Abstract: This paper presents the numerical simulation of a double-beam magnetron injection gun (DB-MIG) and beam-wave interaction for 60 GHz, 500 kW gyrotron. The beam-wave interaction calculations, power and frequency growth estimation are performed by using PIC code MAGIC. The maximum output power of 510 kW at 41.5% efficiency, beam currents of 6 A and 12 A, electron beam velocity ratios of 1.41 and 1.25 and beam voltage of 69 kV are estimated. To obtain the design parameters, the DB-MIG with maximum transverse velocity spread less than 5% is designed. The computer simulations are performed by using the commercially available code EGUN and the in-house developed code MIGANS. The simulated results of DB-MIG design obtained by using the EGUN code are also validated with another trajectory code TRAK, which are in good agreement.

  17. Optics of Electron Beam in the Recycler

    International Nuclear Information System (INIS)

    Burov, A.; Kroc, T.; Lebedev, V.; Nagaitsev, S.; Prost, L.; Pruss, S.; Shemyakin, A.; Sutherland, M.; Warner, A.; Kazakevich, G.; Tiunov, M.

    2006-01-01

    Electron cooling of 8.9 GeV/c antiprotons in the Recycler ring (Fermilab) requires high current and good quality of the DC electron beam. Electron trajectories of ∼0.2 A or higher DC electron beam have to be parallel in the cooling section, within ∼ 0.2 mrad, making the beam envelope cylindrical. These requirements yielded a specific scheme of the electron transport from a gun to the cooling section, with electrostatic acceleration and deceleration in the Pelletron. Recuperation of the DC beam limits beam losses at as tiny level as ∼0.001%, setting strict requirements on the return electron line to the Pelletron and a collector. To smooth the beam envelope in the cooling section, it has to be linear and known at the transport start. Also, strength of the relevant optic elements has to be measured with good accuracy. Beam-based optic measurements are being carried out and analysed to get this information. They include beam simulations in the Pelletron, differential optic (beam response) measurements and simulation, beam profile measurements with optical transition radiation, envelope measurements and analysis with orifice scrapers. Current results for the first half-year of commissioning are presented. Although electron cooling is already routinely used for pbar stacking, its efficiency is expected to be improved

  18. Electron Beam Lithography for nano-patterning

    DEFF Research Database (Denmark)

    Greibe, Tine; Anhøj, Thomas Aarøe; Khomtchenko, Elena

    2014-01-01

    in a polymer. Electron beam lithography is a suitable method for nano-sized production, research, or development of semiconductor components on a low-volume level. Here, we present electron beam lithography available at DTU Danchip. We expertize a JEOL 9500FZ with electrons accelerated to an energy of 100ke......, the room temperature is controlled to an accuracy of 0.1 degrees in order to minimize the thermally induced drift of the beam during pattern writing. We present process results in a standard positive tone resist and pattern transfer through etch to a Silicon substrate. Even though the electron beam...... of electrons in the substrate will influence the patterning. We present solutions to overcome these obstacles....

  19. Electron beam curing of polymer matrix composites

    International Nuclear Information System (INIS)

    Janke, C.J.; Wheeler, D.; Saunders, C.

    1998-01-01

    The purpose of the CRADA was to conduct research and development activities to better understand and utilize the electron beam PMC curing technology. This technology will be used to replace or supplement existing PMC thermal curing processes in Department of Energy (DOE) Defense Programs (DP) projects and American aircraft and aerospace industries. This effort involved Lockheed Martin Energy Systems, Inc./Lockheed Martin Energy Research Corp. (Contractor), Sandia National Laboratories, and ten industrial Participants including four major aircraft and aerospace companies, three advanced materials companies, and three electron beam processing organizations. The technical objective of the CRADA was to synthesize and/or modify high performance, electron beam curable materials that meet specific end-use application requirements. There were six tasks in this CRADA including: Electron beam materials development; Electron beam database development; Economic analysis; Low-cost Electron Beam tooling development; Electron beam curing systems integration; and Demonstration articles/prototype structures development. The contractor managed, participated and integrated all the tasks, and optimized the project efforts through the coordination, exchange, and dissemination of information to the project participants. Members of the Contractor team were also the principal inventors on several electron beam related patents and a 1997 R and D 100 Award winner on Electron-Beam-Curable Cationic Epoxy Resins. The CRADA achieved a major breakthrough for the composites industry by having successfully developed high-performance electron beam curable cationic epoxy resins for use in composites, adhesives, tooling compounds, potting compounds, syntactic foams, etc. UCB Chemicals, the world's largest supplier of radiation-curable polymers, has acquired a license to produce and sell these resins worldwide

  20. Plasma channels for electron beam transport

    International Nuclear Information System (INIS)

    Schneider, R.F.; Smith, J.R.; Moffatt, M.E.; Nguyen, K.T.; Uhm, H.S.

    1988-01-01

    In recent years, there has been much interest in transport of intense relativistic electron beams using plasma channels. These channels are formed by either: ionization of an organic gas by UV photoionization or electron impact ionization of a low pressure gas utilizing a low energy (typically several hundred volts) electron gun. The second method is discussed here. As their electron gun, the authors used a 12 volt lightbulb filament which is biased to -400 volts with respect to the grounded 15 cm diameter drift tube. The electrons emitted from the filament are confined by an axial magnetic field of --100 Gauss to create a plasma channel which is less than 1 cm in radius. The channel density has been determined with Langmuir probes and the resulting line densities were found to be 10 11 to 10 12 per cm. When a multi-kiloamp electron beam is injected onto this channel, the beam space charge will eject the plasma electrons leaving the ions behind to charge neutralize the electron beam, hence allowing the beam to propagate. In this work, the authors performed experimental studies on the dynamics of the plasma channel. These include Langmuir probe measurements of a steady state (DC) channel, as well as time-resolved Langmuir probe studies of pulsed channels. In addition they performed experimental studies of beam propagation in these plasma channels. Specifically, they observed the behavior of current transport in these channels. Detailed results of beam transport and channel studies are presented

  1. Development of spin polarized electron beam

    International Nuclear Information System (INIS)

    Nakanishi, Tsutomu

    2001-01-01

    Physical structure of the polarized electron beam production is explained in this paper. Nagoya University group has been improving the quality of beam. The present state of quality and the development objects are described. The new results of the polarized electron reported in 'RES-2000 Workshop' in October 2000, are introduced. The established ground of GaAs type polarized electron beam source, observation of the negative electron affinity (NEA) surface, some problems of NEA surface of high energy polarized electron beam such as the life, time response, the surface charge limited phenomena of NEA surface are explained. The interested reports in the RES-2000 Workshop consisted of observation by SPLEEM (Spin Low Energy Electron Microscope), Spin-STM and Spin-resolved Photoelectron Spectroscopy. To increase the performance of the polarized electron source, we will develop low emittance and large current. (S.Y.)

  2. 1/f noise in titanium doped aluminum thin film deposited by electron beam evaporation method and its dependence on structural variation with temperature

    Science.gov (United States)

    Ananda, P.; Vedanayakam, S. Victor; Thyagarajan, K.; Nandakumar, N.

    2018-05-01

    A brief review of Titanium doped Aluminum film has many attractive properties such as thermal properties and 1/f noise is highlighted. The thin film devices of Titanium doped alluminium are specially used in aerospace technology, automotive, biomedical fields also in microelectronics. In this paper, we discus on 1/f noise and nonlinear effects in titanium doped alluminium thin films deposited on glass substrate using electron beam evaporation for different current densities on varying temperatures of the film. The plots are dawn for 1/f noise of the films at different temperatures ranging from 300°C to 450°C and the slopes are determined. The studies shows a higher order increment in FFT amplitude of low frequency 1/f noise in thin films at annealing temperature 400°C. In this technology used in aerospace has been the major field of application of titanium doped alluminium, being one of the major challenges of the development of new alloys with improved strength at high temperature, wide chord Titanium doped alluminium fan blades increases the efficiency while reducing 1/f noise. Structural properties of XRD is identified.

  3. Attainment of Electron Beam Suitable for Medium Energy Electron Cooling

    International Nuclear Information System (INIS)

    Seletskiy, Sergey M.; Rochester U.

    2005-01-01

    Electron cooling of charged particle beams is a well-established technique at electron energies of up to 300 keV. However, up to the present time the advance of electron cooling to the MeV-range energies has remained a purely theoretical possibility. The electron cooling project at Fermilab has recently demonstrated the first cooling of 8.9 GeV/c antiprotons in the Recycler ring, and therefore, has proved the validity of the idea of relativistic electron cooling. The Recycler Electron Cooler (REC) is the key component of the Tevatron Run II luminosity upgrade project. Its performance depends critically on the quality of electron beam. A stable electron beam of 4.3 MeV carrying 0.5 A of DC current is required. The beam suitable for the Recycler Electron Cooler must have an angular spread not exceeding 200 (micro)rad. The full-scale prototype of the REC was designed, built and tested at Fermilab in the Wideband laboratory to study the feasibility of attaining the high-quality electron beam. In this thesis I describe various aspects of development of the Fermilab electron cooling system, and the techniques used to obtain the electron beam suitable for the cooling process. In particular I emphasize those aspects of the work for which I was principally responsible. Chapter 1 is an introduction where I describe briefly the theory and the history of electron cooling, and derive the requirements to the quality of electron beam and requirements to the basic parameters of the Recycler Electron Cooler. Chapter 2 is devoted to the theoretical consideration of the motion of electrons in the cooling section, description of the cooling section and of the measurement of the magnetic fields. In Chapter 3 I consider different factors that increase the effective electron angle in the cooling section and suggest certain algorithms for the suppression of parasitic angles. Chapter 4 is devoted to the measurements of the energy of the electron beam. In the concluding Chapter 5 I review

  4. Mechanical properties of EB-PVD ZrO{sub 2} thermal barrier coatings; Mechanische Eigenschaften von EB-PVD ZrO{sub 2} Waermedaemmschichten

    Energy Technology Data Exchange (ETDEWEB)

    Held, Carolin

    2014-08-29

    In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

  5. EIC Electron Beam Polarimetry Workshop Summary

    International Nuclear Information System (INIS)

    Lorenzon, W.

    2008-01-01

    A summary of the Precision Electron Beam Polarimetry Workshop for a future Electron Ion Collider (EIC) is presented. The workshop was hosted by the University of Michigan Physics Department in Ann Arbor on August 23-24, 2007 with the goal to explore and study the electron beam polarimetry issues associated with the EIC to achieve sub-1% precision in polarization determination. Ideas are being presented that were exchanged among experts in electron polarimetry and source and accelerator design to examine existing and novel electron beam polarization measurement schemes

  6. Electron Beam Ion Sources

    CERN Document Server

    Zschornacka, G.; Thorn, A.

    2013-12-16

    Electron beam ion sources (EBISs) are ion sources that work based on the principle of electron impact ionization, allowing the production of very highly charged ions. The ions produced can be extracted as a DC ion beam as well as ion pulses of different time structures. In comparison to most of the other known ion sources, EBISs feature ion beams with very good beam emittances and a low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays, ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This chapter gives an overview of EBIS physics, the principle of operation, and the known technical solutions. Using examples, the performance of EBISs as well as their applications in various fields of basic research, technology and medicine are discussed.

  7. Electron-beam flue-gas treatment system

    International Nuclear Information System (INIS)

    Aoki, Sinji; Suzuki, Ryoji

    1994-01-01

    The damage of forests in the world due to acid rain has become serious problems, and the development of high efficiency and economical desulfurization and denitration technologies for combustion exhaust gas has been desired. Japan leads the world in exhaust gas treatment technology. The conventional technologies have been the desulfurization by lime gypsum process and the denitration by ammonia catalytic reduction process. The solution by entirely new concept is the electron beam treatment technology for exhaust gas. This technology is a dry process without drain, and does not require catalyst. The byproduct from this technology was approved as a fertilizer. The electron beam treatment technology is called EBA (electron beam with ammonia). The exhaust gas treatment technology by electron beam process is constituted by the cooling of exhaust gas, ammonia addition, electron beam irradiation and the separation of byproduct. The features of the technology are the simultaneous removal of sulfur and nitrogen oxides, dry process, the facilities are simple and the operation is easy, easy following to load variation and the utilization of byproduct. The reaction mechanism of desulfurization and denitration, the course of development, the electron beam generator, and the verifying test are reported. (K.I.)

  8. Monitor tables for electron beams in radiotherapy

    International Nuclear Information System (INIS)

    Christ, G.; Dohm, O.S.

    2007-01-01

    The application of electron beams in radiotherapy is still based on tables of monitor units, although 3-D treatment planning systems for electron beams are available. This have several reasons: The need for 3-D treatment planning is not recognized; there is no confidence in the calculation algorithm; Monte-Carlo algorithms are too time-consuming; and the effort necessary to measure basic beam data for 3-D planning is considered disproportionate. However, the increasing clinical need for higher dosimetric precision and for more conformal electron beams leads to the requirement for more sophisticated tables of monitor units. The present paper summarizes and discusses the main aspects concerning the preparation of tables of monitor units for electron beams. The measurement equipment and procedures for measuring basic beam data needed for tables of monitor units for electron beams are described for a standard radiation therapy linac. The design of tables of monitor units for standard electron applicators is presented; this design can be extended for individual electron inserts, to variable applicator surface distances, to oblique beam incidence, and the use of bolus material. Typical data of an Elekta linac are presented in various tables. (orig.)

  9. Acceleration of laser-injected electron beams in an electron-beam driven plasma wakefield accelerator

    International Nuclear Information System (INIS)

    Knetsch, Alexander

    2018-03-01

    Plasma wakefields deliver accelerating fields that are approximately a 100 times higher than those in conventional radiofrequency or even superconducting radiofrequency cavities. This opens a transformative path towards novel, compact and potentially ubiquitous accelerators. These prospects, and the increasing demand for electron accelerator beamtime for various applications in natural, material and life sciences, motivate the research and development on novel plasma-based accelerator concepts. However, these electron beam sources need to be understood and controlled. The focus of this thesis is on electron beam-driven plasma wakefield acceleration (PWFA) and the controlled injection and acceleration of secondary electron bunches in the accelerating wake fields by means of a short-pulse near-infrared laser. Two laser-triggered injection methods are explored. The first one is the Trojan Horse Injection, which relies on very good alignment and timing control between electron beam and laser pulse and then promises electron bunches with hitherto unprecedented quality as regards emittance and brightness. The physics of electron injection in the Trojan Horse case is explored with a focus on the final longitudinal bunch length. Then a theoretical and numerical study is presented that examines the physics of Trojan Horse injection when performed in an expanding wake generated by a smooth density down-ramp. The benefits are radically decreased drive-electron bunch requirements and a unique bunch-length control that enables longitudinal electron-bunch shaping. The second laser-triggered injection method is the Plasma Torch Injection, which is a versatile, all-optical laser-plasma-based method capable to realize tunable density downramp injection. At the SLAC National Laboratory, the first proof-of-principle was achieved both for Trojan Horse and Plasma Torch injection. Setup details and results are reported in the experimental part of the thesis along with the commissioning

  10. Thin film deposition and characterization of pure and iron-doped electron-beam evaporated tungsten oxide for gas sensors

    Energy Technology Data Exchange (ETDEWEB)

    Tesfamichael, Tuquabo, E-mail: t.tesfamichael@qut.edu.a [Faculty of Built Environment and Engineering, School of Engineering Systems, Queensland University of Technology, 2 George Street, Brisbane, QLD 4000 (Australia); Arita, Masashi [Graduate School of Information Science and Technology, Hokkaido University, Kita-14, Nishi-9, Kita-ku, Sapporo, 060-0814 (Japan); Bostrom, Thor [Faculty of Science and Technology, School of Physical and Chemical Sciences, Queensland University of Technology, 2 George Street, Brisbane, QLD 4000 (Australia); Bell, John [Centre for Built Environment and Engineering Research, Queensland University of Technology, 2 George Street, Brisbane, QLD 4000 (Australia)

    2010-06-30

    Pure tungsten oxide (WO{sub 3}) and iron-doped (10 at.%) tungsten oxide (WO{sub 3}:Fe) nanostructured thin films were prepared using a dual crucible Electron Beam Evaporation (EBE) technique. The films were deposited at room temperature under high vacuum onto glass as well as alumina substrates and post-heat treated at 300 {sup o}C for 1 h. Using Raman spectroscopy the as-deposited WO{sub 3} and WO{sub 3}:Fe films were found to be amorphous, however their crystallinity increased after annealing. The estimated surface roughness of the films was similar (of the order of 3 nm) to that determined using Atomic Force Microscopy (AFM). As observed by AFM, the WO{sub 3}:Fe film appeared to have a more compact surface as compared to the more porous WO{sub 3} film. X-ray photoelectron spectroscopy analysis showed that the elemental stoichiometry of the tungsten oxide films was consistent with WO{sub 3}. A slight difference in optical band gap energies was found between the as-deposited WO{sub 3} (3.22 eV) and WO{sub 3}:Fe (3.12 eV) films. The differences in the band gap energies of the annealed films were significantly higher, having values of 3.12 eV and 2.61 eV for the WO{sub 3} and WO{sub 3}:Fe films respectively. The heat treated films were investigated for gas sensing applications using noise spectroscopy. It was found that doping of Fe to WO{sub 3} produced gas selectivity but a reduced gas sensitivity as compared to the WO{sub 3} sensor.

  11. Simulation of the electron acoustic instability for a finite-size electron beam system

    International Nuclear Information System (INIS)

    Lin, C.S.; Winske, D.

    1987-01-01

    Satellite observations at midlatitudes (≅20,000 km) near the earth's dayside polar cusp boundary layer indicate that the upward electron beams have a narrow latitudinal width up to 0.1 0 . In the cusp boundary layer where the electron population consists of a finite-size electron beam in a background of uniform cold and hot electrons, the electron acoustic mode is unstable inside the electron beam but damped outside the electron beam. Simulations of the electron acoustic instability for a finite-size beam system are carried out with a particle-in-cell code to investigate the heating phenomena associated with the instability and the width of the heating region. The simulations show that the finite-size electron beam radiates electrostatic electron acoustic waves. The decay length of the electron acoustic waves outside the beam in the simulation agrees with the spatial decay length derived from the linear dispersion equation

  12. Field size and dose distribution of electron beam

    International Nuclear Information System (INIS)

    Kang, Wee Saing

    1980-01-01

    The author concerns some relations between the field size and dose distribution of electron beams. The doses of electron beams are measured by either an ion chamber with an electrometer or by film for dosimetry. We analyzes qualitatively some relations; the energy of incident electron beams and depths of maximum dose, field sizes of electron beams and depth of maximum dose, field size and scatter factor, electron energy and scatter factor, collimator shape and scatter factor, electron energy and surface dose, field size and surface dose, field size and central axis depth dose, and field size and practical range. He meets with some results. They are that the field size of electron beam has influence on the depth of maximum dose, scatter factor, surface dose and central axis depth dose, scatter factor depends on the field size and energy of electron beam, and the shape of the collimator, and the depth of maximum dose and the surface dose depend on the energy of electron beam, but the practical range of electron beam is independent of field size

  13. Industrial applications of electron beam technology

    International Nuclear Information System (INIS)

    Khairul Zaman Mohd Dahlan

    1997-01-01

    Electron beam technology was first introduced in Malaysia in 1989 with the conclusion of the bilateral cooperation between the Malaysian Institute for Nuclear Technology Research (MINT) and Japan International Co-operation Agency (JICA) on Radiation Application Projects. Two electron beam accelerators with energy of 3.0 MeV and 200 keV were installed at MINT. These two accelerators pave the way for R and D to be carried out in radiation processing of polymers for cross-linking and surface curing. In 1994, another electron beam accelerator was installed in the private sector for cross-linking of home appliance wires. Since then, two more accelerators were installed in the private sector for cross-linking of heat shrinkable plastic films. Recently, a local company has acquired a low energy electron beam machine for cross-linking of plastic film. Within a period of 7 years, industrial applications of electron beam technology in Malaysia have increased significantly

  14. Use of Langmuir probe for analysis of charged particles in metal vapour generated by electron beam heating

    International Nuclear Information System (INIS)

    Dikshit, B; Bhatia, M S

    2008-01-01

    During electron beam evaporation of metal, a certain fraction of the vapor is ionized due to various processes such as Saha ionization and electron impact. These charge particles constitute a plasma which expands along with the vapour. To know about parameters of this plasma viz. electron temperature, electron density, plasma potential, we have used a disc type Langmuir probe inside the plasma. The measured electron temperature was found to be about ∼0.15eV (1740K) and measured plasma potential was ∼1V. The low value of electron temperature as compared to the source temperature, established that plasma cools significantly while traversing the distance between the source and the point of measurement. Again as the electron temperature was approximately same as the ion temperature of the vapor (expected to be same as kinetic temperature of vapor for collisional flow), we concluded that a kind of equilibrium had been established in the plasma. Finally, various processes responsible for ionization of the vapor are discussed and it was found that both Saha ionization and electron impact processes play important role in ionization of the uranium vapor generated by electron beam heating

  15. Effect of nitrogen gas flow rate on the tribological properties of TiN coated HSS using CAE PVD technique

    International Nuclear Information System (INIS)

    Mubarak, A.; Hamzah, E.; Toff, M.R.M.

    2005-01-01

    High-Speed Steel (HSS) is a material that used in various Hi-Tech industries for many reasons. The aim of this study is to investigate the tribological properties of TiN (Titanium Nitride)-coated HSS. Using Physical Vapour Deposition (PVD) Cathodic Arc Evaporation (CAE) technique coated samples. The goal of this work is to determine usefulness of TiN coatings in order to improve tribological properties of HSS, as vastly use in cutting tool industry for various applications. A Pin-on-Disc test showed that the minimum value recorded for friction coefficient was reduced from 0.294 to 0.239 when the nitrogen gas flow rate was increased from 100 sccm to 200 sccm. The decrease in friction coefficient resulted from the reduction in macrodroplets by increasing the nitrogen gas flow rate during deposition. The worn surface morphology of the TiN coated HSS was observed on a Field Emission Scanning Electron Microscope (FE-SEM), and the elemental composition on the wear scar were investigated by means of EDXS. (Author)

  16. Evaporation of carbon using electrons of a high density plasma

    International Nuclear Information System (INIS)

    Muhl, S.; Camps, E.; Escobar A, L.; Garcia E, J.L.; Olea, O.

    1999-01-01

    The high density plasmas are used frequently in the preparation of thin films or surface modification, for example to nitridation. In these processes, are used mainly the ions and the neutrals which compose the plasma. However, the electrons present in the plasma are not used, except in the case of chemical reactions induced by collisions, although the electron bombardment usually get hot the work piece. Through the adequate polarization of a conductor material, it is possible to extract electrons from a high density plasma at low pressure, that could be gotten the evaporation of this material. As result of the interaction between the plasma and the electron flux with the vapor produced, this last will be ionized. In this work, it is reported the use of this novelty arrangement to prepare carbon thin films using a high density argon plasma and a high purity graphite bar as material to evaporate. It has been used substrates outside plasma and immersed in the plasma. Also it has been reported the plasma characteristics (temperature and electron density, energy and ions flux), parameters of the deposit process (deposit rate and ion/neutral rate) as well as the properties of the films obtained (IR absorption spectra and UV/Vis, elemental analysis, hardness and refractive index. (Author)

  17. Plasma lenses for focusing relativistic electron beams

    International Nuclear Information System (INIS)

    Govil, R.; Wheeler, S.; Leemans, W.

    1997-01-01

    The next generation of colliders require tightly focused beams with high luminosity. To focus charged particle beams for such applications, a plasma focusing scheme has been proposed. Plasma lenses can be overdense (plasma density, n p much greater than electron beam density, n b ) or underdense (n p less than 2 n b ). In overdense lenses the space-charge force of the electron beam is canceled by the plasma and the remaining magnetic force causes the electron beam to self-pinch. The focusing gradient is nonlinear, resulting in spherical aberrations. In underdense lenses, the self-forces of the electron beam cancel, allowing the plasma ions to focus the beam. Although for a given beam density, a uniform underdense lens produces smaller focusing gradients than an overdense lens, it produces better beam quality since the focusing is done by plasma ions. The underdense lens can be improved by tapering the density of the plasma for optimal focusing. The underdense lens performance can be enhanced further by producing adiabatic plasma lenses to avoid the Oide limit on spot size due to synchrotron radiation by the electron beam. The plasma lens experiment at the Beam Test Facility (BTF) is designed to study the properties of plasma lenses in both overdense and underdense regimes. In particular, important issues such as electron beam matching, time response of the lens, lens aberrations and shot-to-shot reproducibility are being investigated

  18. Compact two-beam push-pull free electron laser

    Science.gov (United States)

    Hutton, Andrew [Yorktown, VA

    2009-03-03

    An ultra-compact free electron laser comprising a pair of opposed superconducting cavities that produce identical electron beams moving in opposite directions such that each set of superconducting cavities accelerates one electron beam and decelerates the other electron beam. Such an arrangement, allows the energy used to accelerate one beam to be recovered and used again to accelerate the second beam, thus, each electron beam is decelerated by a different structure than that which accelerated it so that energy exchange rather than recovery is achieved resulting in a more compact and highly efficient apparatus.

  19. Electron Beam Polarization Measurement Using Touschek Lifetime Technique

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Changchun; /Duke U., DFELL; Li, Jingyi; /Duke U., DFELL; Mikhailov, Stepan; /Duke U., DFELL; Popov, Victor; /Duke U., DFELL; Wu, Wenzhong; /Duke U., DFELL; Wu, Ying; /Duke U., DFELL; Chao, Alex; /SLAC; Xu, Hong-liang; /Hefei, NSRL; Zhang, Jian-feng; /Hefei, NSRL

    2012-08-24

    Electron beam loss due to intra-beam scattering, the Touschek effect, in a storage ring depends on the electron beam polarization. The polarization of an electron beam can be determined from the difference in the Touschek lifetime compared with an unpolarized beam. In this paper, we report on a systematic experimental procedure recently developed at Duke FEL laboratory to study the radiative polarization of a stored electron beam. Using this technique, we have successfully observed the radiative polarization build-up of an electron beam in the Duke storage ring, and determined the equilibrium degree of polarization and the time constant of the polarization build-up process.

  20. Fabrication of Arrays of Metal and Metal Oxide Nanotubes by Shadow Evaporation

    NARCIS (Netherlands)

    Dickey, Michael D.; Weiss, Emily A.; Smythe, Elizabeth J.; Chiechi, Ryan C.; Capasso, Federico; Whitesides, George M.

    2008-01-01

    This paper describes a simple technique for fabricating uniform arrays of metal and metal oxide nanotubes with controlled heights and diameters. The technique involves depositing material onto an anodized aluminum oxide (AAO) membrane template using a collimated electron beam evaporation source. The

  1. Beam dosimetry in high-power electron accelerators

    International Nuclear Information System (INIS)

    Popov, V.N.; Zhitomirskii, B.M.; Ermakov, A.N.; Terebilin, A.V.; Stryukov, V.A.

    1987-01-01

    In order to evaluate beam utilization efficiency, measure the radiation yield, and determine the cost effectiveness of the new technologies, it is necessary to know the radiation power of the electron beam absorbed by the reacting medium. To measure the electron-beam power the authors designed, built, and tested a radiation detector combining a Faraday cylinder with a continuous-flow calorimeter. The construction of the detector is shown. The radiation detector was tested on a number of electron accelerators. The beam-power and mean-electron-energy measurement results for the LUE-8M accelerator with 8 MeV maximum electron energy are given

  2. Electron beam extraction from a HVPES

    International Nuclear Information System (INIS)

    Marghitu, S.; Cramariuc, R.; Nicolescu, I.; Niculescu, M.

    1996-01-01

    The results of the research concerning the extraction system of the fast electrons from a cold cathode high voltage glow discharge plasma electron source (HVPES) are presented. For using the electron beam in a more flexible way, that is changing the shape of the minimum cross-section, (or beam cross-over), of the beam in a sample S frontal plane, without perturbing the discharge parameters, some modifications to a reference internal geometry were tested. Finally, a geometry was found in which the discharge volume may be separated in two parts, one, 'a discharge space', filled with plasma and fast electrons and another, 'working space', occupied specially by the fast electron beam. In this new geometry the electrical discharge parameters, I d - discharge current, U d - discharge voltage, were the same as for the reference geometry. (authors)

  3. Industrial applications or electron beams

    International Nuclear Information System (INIS)

    Martin, J. I.

    2001-01-01

    Industrial use of electron beams began in the 1950's with the crosslinking of polyethylene film and wire insulation. Today the number of electron beam Processing Systems installed for industrial applications throughout the world has grown to more than six hundred stations in over 35 countries. Total installed power is now approaching 40 megawatts (over 8 million tons of products per year). Electron beam is now utilized by many major industries including plastics, automotive, rubber goods, wire and cable, electrical insulation, semiconductor, medical, packaging, or pollution control. The principal effect of high-energy electrons is to produce ions in the materials treated, resulting in the liberation of orbital electrons. As a result, the original molecule is modified and the ree radicals combine to form new molecules with new chemical reactions or dis organisation od the DNA chains of living organisms (insects, fungus, microorganisms, etc.). (Author) 8 refs

  4. Electron beam interaction with space plasmas

    International Nuclear Information System (INIS)

    Krafft, C.; Volokitin, A.S.

    1999-01-01

    Active space experiments involving the controlled injection of electron beams and the formation of artificially generated currents can provide in many cases a calibration of natural phenomena connected with the dynamic interaction of charged particles with fields. They have a long history beginning from the launches of small rockets with electron guns in order to map magnetic fields lines in the Earth's magnetosphere or to excite artificial auroras. Moreover, natural beams of charged particles exist in many space and astrophysical plasmas and were identified in situ by several satellites; a few examples are beams connected with solar bursts, planetary foreshocks or suprathermal fluxes traveling in planetary magnetospheres. Many experimental and theoretical works have been performed in order to interpret or plan space experiments involving beam injection as well as to understand the physics of wave-particle interaction, as wave radiation, beam dynamics and background plasma modification. Recently, theoretical studies of the nonlinear evolution of a thin monoenergetic electron beam injected in a magnetized plasma and interacting with a whistler wave packet have led to new results. The influence of an effective dissipation process connected with whistler wave field leakage out of the beam volume to infinity (that is, effective radiation outside the beam) on the nonlinear evolution of beam electrons distribution in phase space has been studied under conditions relevant to active space experiments and related laboratory modelling. The beam-waves system's evolution reveals the formation of stable nonlinear structures continuously decelerated due to the effective friction imposed by the strongly dissipated waves. The nonlinear interaction between the electron bunches and the wave packet are discussed in terms of dynamic energy exchange, particle trapping, slowing down of the beam, wave dissipation and quasi-linear diffusion. (author)

  5. Introduction to electron beam processing

    Energy Technology Data Exchange (ETDEWEB)

    Kawakami, Waichiro [Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment

    1994-12-31

    The contents are general features in the irradiation of polymers, electron beam machines - low energy, medium energy, high energy; application of EB machine in industries, engineering of EB processing, dosimetry of EB (electron beam) safe operation of EB machine, recent topics on EB processing under development. 3 tabs., 4 figs., 17 refs.

  6. Introduction to electron beam processing

    International Nuclear Information System (INIS)

    Waichiro Kawakami

    1994-01-01

    The contents are general features in the irradiation of polymers, electron beam machines - low energy, medium energy, high energy; application of EB machine in industries, engineering of EB processing, dosimetry of EB (electron beam) safe operation of EB machine, recent topics on EB processing under development. 3 tabs., 4 figs., 17 refs

  7. Hollow Electron Beam Collimation for HL-LHC - Effects on the Beam Core

    Energy Technology Data Exchange (ETDEWEB)

    Fitterer, M. [Fermilab; Stancari, G. [Fermilab; Valishev, A. [Fermilab; Bruce, R. [CERN; Papotti, G [CERN; Redaelli, S. [CERN; Valentino, G. [Malta U.; Valentino, G. [CERN; Valuch, D. [CERN; Xu, C. [CERN

    2017-06-13

    Collimation with hollow electron beams is currently one of the most promising concepts for active halo control in the High Luminosity Large Hadron Collider (HL-LHC). To ensure the successful operation of the hollow beam collimator the unwanted effects on the beam core, which might arise from the operation with a pulsed electron beam, must be minimized. This paper gives a summary of the effect of hollow electron lenses on the beam core in terms of sources, provides estimates for HL-LHC and discusses the possible mitigation methods.

  8. Electron beam effects in auger electron spectroscopy and scanning electron microscopy

    International Nuclear Information System (INIS)

    Fontaine, J.M.; Duraud, J.P.; Le Gressus, C.

    1979-01-01

    Electron beam effects on Si(100) and 5% Fe/Cr alloy samples have been studied by measurements of the secondary electron yield delta, determination of the surface composition by Auger electron spectroscopy and imaging with scanning electron microscopy. Variations of delta as a function of the accelerating voltage Esub(p) (0.5 -9 Torr has no effect on technological samples covered with their reaction layers; the sensitivities to the beam depend rather on the earlier mechanical, thermal and chemical treatment of the surfaces. (author)

  9. Investigation of the evaporation process conditions on the optical constants of zirconia films

    International Nuclear Information System (INIS)

    Dobrowolski, J.A.; Grant, P.D.; Simpson, R.; Waldorf, A.

    1989-01-01

    Deposition parameters required for producing zirconia films for use in optical multilayer systems by electron-beam gun evaporation of zirconia and zirconium starting materials were investigated. The optical constants were determined as a function of distance, partial pressure of oxygen, and angle of incidence. The direct and reactive evaporation processes yielded ZrO 2 films with refractive indices of 2.08 and 2.14, respectively, for vapor incident on the substrate at normal incidence

  10. Beam line design for a low energy electron beam

    International Nuclear Information System (INIS)

    Arvind Kumar; Mahadevan, S.

    2002-01-01

    The design of a beam line for transport of a 70 keV electron beam from a thermionic gun to the Plane Wave Transformer (PWT) linac incorporating two solenoid magnets, a beam profile monitor and drift sections is presented. We used beam dynamics codes EGUN, PARMELA and compare simulated results with analytical calculations. (author)

  11. Electron beam extraction from a HVPES

    Energy Technology Data Exchange (ETDEWEB)

    Marghitu, S; Cramariuc, R [Accelerators Laboratory, Institute of Physics and Technology for Radiation Devices, PO Box MG-06, R-76900 Bucharest (Romania); Nicolescu, I; Niculescu, M [Institute of Research and Design for Electrical Engineering, ICPE - Electrostatica, Splaiul Unirii 313, Sect. 3, R-74204 Bucharest (Romania)

    1997-12-31

    The results of the research concerning the extraction system of the fast electrons from a cold cathode high voltage glow discharge plasma electron source (HVPES) are presented. For using the electron beam in a more flexible way, that is changing the shape of the minimum cross-section, (or beam cross-over), of the beam in a sample S frontal plane, without perturbing the discharge parameters, some modifications to a reference internal geometry were tested. Finally, a geometry was found in which the discharge volume may be separated in two parts, one, `a discharge space`, filled with plasma and fast electrons and another, `working space`, occupied specially by the fast electron beam. In this new geometry the electrical discharge parameters, I{sub d} - discharge current, U{sub d} - discharge voltage, were the same as for the reference geometry. (authors) 5 refs., 4 figs., 3 tabs.

  12. Electron beam producing system for very high acceleration voltages and beam powers

    International Nuclear Information System (INIS)

    Andelfinger, C.; Dommaschk, W.; Ott, W.; Ulrich, M.; Weber, G.

    1975-01-01

    An electron beam producing system for acceleration voltages on the order of megavolts and beam powers on the order of gigawatts is described. A tubular housing of insulating material is used, and adjacent to its one closed end, a field emission cathode with a large surface area is arranged, while at its other end, from which the electron beam emerges, an annular anode is arranged. The device for collimating the electron beam consists of annular electrodes. (auth)

  13. The evaporative vector: Homogeneous systems

    International Nuclear Information System (INIS)

    Klots, C.E.

    1987-05-01

    Molecular beams of van der Waals molecules are the subject of much current research. Among the methods used to form these beams, three-sputtering, laser ablation, and the sonic nozzle expansion of neat gases - yield what are now recognized to be ''warm clusters.'' They contain enough internal energy to undergo a number of first-order processes, in particular that of evaporation. Because of this evaporation and its attendant cooling, the properties of such clusters are time-dependent. The states of matter which can be arrived at via an evaporative vector on a typical laboratory time-scale are discussed. Topics include the (1) temperatures, (2) metastability, (3) phase transitions, (4) kinetic energies of fragmentation, and (5) the expression of magical properties, all for evaporating homogeneous clusters

  14. Proton-antiproton colliding beam electron cooling

    International Nuclear Information System (INIS)

    Derbenev, Ya.S.; Skrinskij, A.N.

    1981-01-01

    A possibility of effective cooling of high-energy pp tilde beams (E=10 2 -10 3 GeV) in the colliding mode by accompanying radiationally cooled electron beam circulating in an adjacent storage ring is studied. The cooling rate restrictions by the pp tilde beam interaction effects while colliding and the beam self-heating effect due to multiple internal scattering are considered. Some techniques permitting to avoid self-heating of a cooling electron beam or suppress its harmful effect on a heavy particle beam cooling are proposed. According to the estimations the cooling time of 10 2 -10 3 s order can be attained [ru

  15. Recubrimientos por PVD decorativos sobre cerámicas

    Directory of Open Access Journals (Sweden)

    García, J. A.

    2006-08-01

    Full Text Available During the last years PVD coatings has been used for decorative purposes on ceramics and other substrates. Standards layers like TiN, CrN, TiCN, etc, give us the possibly of obtaining a wide range of colours, with a good mechanical, chemical properties. This paper gathers the works carried out in the Center of Advance Surface engineering of AIN during the three last years in the field of the decorative coatings. Different layer have been deposited by means of a METAPLAS 232 PVD equipment. A complete chemical and mechanical characterisation have been carried out on the different deposited layers like ultramicroindentation, scratch tests, wear resistance and GDOES.

    En los últimos años se ha venido estudiado la aplicabilidad de las técnicas de depósitos mediante métodos físicos en fase vapor (PVD, para la realización de recubrimientos sobre cerámicas y otros substratos con fines decorativos. Los recubrimientos estándar por PVD como el TiN, CrN, TiCN, etc, ofrecen la posibilidad de conseguir acabados de apariencia metálica, de una amplia gama de colores, y con buenas propiedades mecánicas y químicas, como resistencia a la abrasión, estabilidad térmica, o resistencia a la corrosión. En este trabajo se recogen las experiencias realizadas en el recubrimiento y caracterización de cerámicas decorativas, durante los tres últimos años, en el Centro de Ingeniería de Superficies de la Asociación de la Industria Navarra. Los distintos tipos de recubrimientos se han realizado mediante un equipo de PVD modelo METAPLAS 232, con seis evaporadores de arco eléctrico y sistema de limpieza iónica patentado AEGD. Los recubrimientos han sido caracterizados, tanto química como mecánicamente, empleando las más modernas técnicas tribológicas (ultramicrodureza, scrascth tests, resistencia al desgaste... y espectroscópicas óptica por descarga luminiscente (GDOES. Los resultados obtenidos muestran que las técnicas de PVD son una

  16. Shielding in electron beams used in radiotherapy

    International Nuclear Information System (INIS)

    Sentenac, Irenee.

    1979-01-01

    The interactions of electron beams with initial energies between 7 and 30 MeV have been studied in various materials including polystyrene, aluminium, copper and lead. The following experimental results have been found: estimation of measurement point displacement in a cylindrical chamber and of its variations with electron beam energy, empirical relations between the energy at the surface and the practical range of the electrons in various materials, an estimation of the relative ionisation due to the 'bremsstrahlung' measured behind different materials with beam complete shielding. Improvement of electron beam collimation is suggested after analysis of the dose distribution behind partial shielding [fr

  17. Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperature

    Science.gov (United States)

    Sun, Hong-Tao; Wang, Xiao-Ping; Kou, Zhi-Qi; Wang, Li-Jun; Wang, Jin-Ye; Sun, Yi-Qing

    2015-04-01

    Highly transparent indium-free composite electrodes of TiO2/Cu/TiO2 are deposited by electron-beam evaporation at room temperature. The effects of Cu thickness and annealing temperature on the electrical and optical properties of the multilayer film are investigated. The critical thickness of Cu mid-layer to form a continuous conducting layer is found to be 11 nm. The multilayer with a mid-Cu thickness of 11 nm is optimized to obtain a resistivity of 7.4×10-5 Ω·cm and an average optical transmittance of 86% in the visible spectral range. The figure of merit of the TiO2/Cu(11 nm)/TiO2 multilayer annealed at 150 °C reaches a minimum resistivity of 5.9×10-5 Ω·cm and an average optical transmittance of 88% in the visible spectral range. The experimental results indicate that TiO2/Cu/TiO2 multilayers can be used as a transparent electrode for solar cell and other display applications. Project supported by the Research Innovation Key Project of Education Committee of Shanghai, China (Grant No. 14ZZ137) and the National Cultivation Fund from University of Shanghai for Science and Technology (Grant No. 14XPM04).

  18. Electron-beam-excited gas laser research

    International Nuclear Information System (INIS)

    Johnson, A.W.; Gerardo, J.B.; Patterson, E.L.; Gerber, R.A.; Rice, J.K.; Bingham, F.W.

    1975-01-01

    Net energy gain in laser fusion places requirements on the laser that are not realized by any existing laser. Utilization of relativistic electron beams (REB's), a relatively new source for the excitation of gas laser media, may lead to new lasers that could satisfy these requirements. Already REB's have been utilized to excite gas laser media and produce gas lasers that have not been produced as successfully any other way. Electron-beam-excitation has produced electronic-transition dimer lasers that have not yet been produced by any other excitation scheme (for example, Xe 2 / sup *(1)/, Kr:O(2 1 S)/sup 2/, KrF/sup *(3)/). In addition, REB's have initiated chemical reactions to produce HF laser radiation with unique and promising results. Relativistic-electron-beam gas-laser research is continuing to lead to new lasers with unique properties. Results of work carried out at Sandia Laboratories in this pioneering effort of electron-beam-excited-gas lasers are reviewed. (U.S.)

  19. Electron-Beam Produced Air Plasma: Optical Measurement of Beam Current

    Science.gov (United States)

    Vidmar, Robert; Stalder, Kenneth; Seeley, Megan

    2006-10-01

    Experiments to quantify the electron beam current and distribution of beam current in air plasma are discussed. The air plasma is produced by a 100-keV 10-mA electron beam source that traverses a transmission window into a chamber with air as a target gas. Air pressure is between 1 mTorr and 760 Torr. Strong optical emissions due to electron impact ionization are observed for the N2 2^nd positive line at 337.1 nm and the N2^+ 1^st negative line at 391.4 nm. Calibration of optical emissions using signals from the isolated transmission window and a Faraday plate are discussed. The calibrated optical system is then used to quantify the electron distribution in the air plasma.

  20. Electron beam curable polymer thick film

    International Nuclear Information System (INIS)

    Nagata, Hidetoshi; Kobayashi, Takashi

    1988-01-01

    Currently, most printed circuit boards are produced by the selective etching of copper clads laminated on dielectric substrates such as paper/phenolic resion or nonwoven glass/epoxy resin composites. After the etchig, various components such as transistors and capacitors are mounted on the boards by soldering. But these are troublesome works, therefore, as an alternative, printing method has been investigated recently. In the printing method, conductor circuits and resistors can be made by printing and curing of the specially prepared paste on dielectric substrates. In the near future, also capacitors are made by same method. Usually, conductor paste, resistor paste and dielectric paste are employed, and in this case, the printing is screen printing, and the curing is done thermally. In order to avoid heating and the deterioration of substrates, attention was paid to electron beam curing, and electron beam curable polymer thick film system was developed. The electron beam curable paste is the milled mixture of a filler and an electron beam curable binder of oligomer/monomer. The major advantage of electron beam curable polymer thick film, the typical data of a printed resistor of this type and its trial are reported. (K.I.)

  1. APPARATUS FOR ELECTRON BEAM HEATING CONTROL

    Science.gov (United States)

    Jones, W.H.; Reece, J.B.

    1962-09-18

    An improved electron beam welding or melting apparatus is designed which utilizes a high voltage rectifier operating below its temperature saturation region to decrease variations in electron beam current which normally result from the gas generated in such apparatus. (AEC)

  2. Application of Discharges in Vapor of Evaporated Metals for the Film Deposition from the Ionized Stream

    International Nuclear Information System (INIS)

    Kostin, E.G.

    2006-01-01

    results of researches of the discharge device for ionization of the vapor of solid materials are presented. Evaporation of a material was made by an electron gun with a deviation of a beam on 180 degree. Diode type discharge device for ionization was placed above a surface of evaporated metal and was in a longitudinal adjustable magnetic field. Discharge was carried out in crossed electric and magnetic fields. Partial ionization of the vapor was made by primary and secondary electrons of the gun in a vapor cloud above evaporated substance. Physical properties and structure of the films. The comparative analysis of the films properties, besieged in conditions of influence of bombardment by ions of evaporated metal were studied depending on energy and the contents of ions in a stream of particles on a substrate

  3. Electron beam generation form a superemissive cathode

    International Nuclear Information System (INIS)

    Hsu, T.-Y.; Liou, R.-L.; Kirkman-Amemiya, G.; Gundersen, M.A.

    1991-01-01

    An experimental study of electron beams produced by a superemissive cathode in the Back-Lighted Thyratron (BLT) and the pseudospark is presented. This work is motivated by experiments demonstrating very high current densities (≥10 kA/cm 2 over an area of 1 cm 2 ) from the pseudospark and BLT cathode. This high-density current is produced by field-enhanced thermionic emission from the ion beam-heated surface of a molybdenum cathode. This work reports the use of this cathode as a beam source, and is to be distinguished from previous work reporting hollow cathode-produced electron beams. An electron beam of more than 260 A Peak current has been produced with 15 kV applied voltage. An efficiency of ∼10% is estimated. These experimental results encourage further investigation of the super-emissive cathode as an intense electron beam source for applications including accelerator technology

  4. Electron-beam synthesis of fuel in the gas phase

    International Nuclear Information System (INIS)

    Ponomarev, A.V.; Holodkova, E.M.; Ershov, B.G.

    2011-01-01

    Complete text of publication follows. Tendencies of world development focus attention on a vegetative biomass as on the major raw resource for future chemistry and a fuel industry. The significant potential for perfection of biomass conversion processes is concentrated in the field of radiation-chemical methods. Both the mode of post-radiation distillation and mode of electron-beam distillation of biomass have been investigated as well as the mode of gas-phase synthesis of liquid engine fuel from of biomass distillation products. Synergistic action of radiation and temperature has been analyzed at use of the accelerated electron beams allowing to combine radiolysis with effective radiation heating of a material without use of additional heaters. At dose rate above 1 kGy/s the electron-beam irradiation results in intensive decomposition of a biomass and evaporation of formed fragments with obtaining of a liquid condensate (∼ 60 wt%), CO 2 and Co gases (13-18 wt%) and charcoal in the residue. Biomass distillation at radiation heating allows to increase almost three times an organic liquid yield in comparison with pyrolysis. The majority of liquid products from cellulose is represented by the furan derivatives considered among the very perspective components for alternative engine fuels. Distilled-off gases and vapors are diluted with gaseous C 1 -C 5 alkanes and again are exposed to an irradiation to produce liquid fuel from a biomass. This transformation is based on a method of electron-beam circulation conversion of gaseous C 1 -C 5 alkanes (Ponomarev, A.V., Radiat. Phys. Chem., 78, 48, 2009) which consists in formation and removal of liquid products with high degree of carbon skeleton branching. The isomers ratio in a liquid may be controlled by means of change of an irradiation condition and initial gas composition. The irradiation of gaseous alkanes together with vaporous products of biomass destruction allows to synthesize the fuel enriched by conventional

  5. Charging-assisted desorption of deuterium films by keV electrons

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Pedersen, Thomas Garm

    2009-01-01

    m. The initial film thickness and the mass loss as result of desorption were monitored by the QCM. The electron beam current was kept at about or below 100 nA to avoid beam-induced evaporation. Secondary electron emission was suppressed to a value below 0.01-0.03 electrons/electron by a repeller...

  6. Physics with polarized electron beams

    International Nuclear Information System (INIS)

    Swartz, M.L.

    1988-01-01

    As a distinct field, elementary particle physics is now approximately forty years old. In all that time, only a few of the thousands of experiments that have been performed have made use of spin polarized particle beams (with apologies to those who have studied neutrino interactions, polarized beam are defined to refer to the case in which the experimenter has control over the polarization direction). If the discussion is restricted to spin polarized electron beams, the number of experiments becomes countable with the fingers of one hand (with several to spare). There are two reasons for this lack of interest. The first is that spin polarized beams are difficult to produce, accelerate, and transport. The second reason is that any physical process that can occur during the collision of a polarized particle with another (polarized or not) can also occur during the collision of unpolarized particles. One might ask then, why has any effort been expended on the subject. The answer, at least in the case of polarized electron beams, is that electron accelerators and storage rings have in recent years achieved sufficient energy to begin to probe the weak interaction directly. The weak interaction distinguishes between left- and right-handed fermionic currents. Left-handed particles interact in a fundamentally different way than their right-handed counterparts. If the experimenter wishes to explore or exploit this difference, he (or she) must either prepare the spin state of the incident particles or analyze the spin state of outgoing particles. For reasons of genearlity and improved statistical precision, the former is usually preferable to the latter. The first of these lectures will review some of the techniques necessary for the production, transport, and monitoring of polarized electron (or positron) beams. The second lecture will survey some of the physics possibilities of polarized electron-positron collisions

  7. Electron beam collimation with a photon MLC for standard electron treatments

    Science.gov (United States)

    Mueller, S.; Fix, M. K.; Henzen, D.; Frei, D.; Frauchiger, D.; Loessl, K.; Stampanoni, M. F. M.; Manser, P.

    2018-01-01

    Standard electron treatments are currently still performed using standard or molded patient-specific cut-outs placed in the electron applicator. Replacing cut-outs and electron applicators with a photon multileaf collimator (pMLC) for electron beam collimation would make standard electron treatments more efficient and would facilitate advanced treatment techniques like modulated electron radiotherapy (MERT) and mixed beam radiotherapy (MBRT). In this work, a multiple source Monte Carlo beam model for pMLC shaped electron beams commissioned at a source-to-surface distance (SSD) of 70 cm is extended for SSDs of up to 100 cm and validated for several Varian treatment units with field sizes typically used for standard electron treatments. Measurements and dose calculations agree generally within 3% of the maximal dose or 2 mm distance to agreement. To evaluate the dosimetric consequences of using pMLC collimated electron beams for standard electron treatments, pMLC-based and cut-out-based treatment plans are created for a left and a right breast boost, a sternum, a testis and a parotid gland case. The treatment plans consist of a single electron field, either alone (1E) or in combination with two 3D conformal tangential photon fields (1E2X). For each case, a pMLC plan with similar treatment plan quality in terms of dose homogeneity to the target and absolute mean dose values to the organs at risk (OARs) compared to a cut-out plan is found. The absolute mean dose to an OAR is slightly increased for pMLC-based compared to cut-out-based 1E plans if the OAR is located laterally close to the target with respect to beam direction, or if a 6 MeV electron beam is used at an extended SSD. In conclusion, treatment plans using cut-out collimation can be replaced by plans of similar treatment plan quality using pMLC collimation with accurately calculated dose distributions.

  8. Multipass autogenous electron beam welding

    International Nuclear Information System (INIS)

    Murphy, J.L.; Mustaleski, T.M. Jr.; Watson, L.C.

    1986-01-01

    A multipass, autogenous welding procedure was developed for 7.6 mm (0.3 in.) wall thickness Type 304L stainless steel cylinders. The joint geometry has a 1.5 mm (0.06 in.) root-face width and a rectangular stepped groove that is 0.762 mm (0.03 in.) wide at the top of the root face and extends 1.5 mm in height, terminating into a groove width of 1.27 mm which extends to the outside of the 1.27 mm high weld-boss. One weld pass is made on the root, three passes on the 0.762 mm wide groove and three passes to complete the weld. Multipass, autogenous, electron beam welds maintain the characteristic high depth-to-width ratios and low heat input of single-pass, electron beam welds. The increased part distortion (which is still much less than from arc processes) in multipass weldments is corrected by a preweld machined compensation. Mechanical properties of multipass welds compare well with single-pass welds. The yield strength of welds in aluminum alloy 5083 is approximately the same for single-pass or multipass electron beam and gas, metal-arc welds. The incidence and size of porosity is less in multipass electron beam welding of aluminum as compared to gas, metal-arc welds. The multipass, autogenous, electron beam welding method has proven to be a reliable way to make some difficult welds in multilayer parts or in an instance where inside part temperature or weld underbead must be controlled and weld discontinuities must be minimized

  9. Electron beam brightness with field immersed emission

    International Nuclear Information System (INIS)

    Boyd, J.K.; Neil, V.K.

    1985-01-01

    The beam quality or brightness of an electron beam produced with field immersed emission is studied with two models. First, an envelope formulation is used to determine the scaling of brightness with current, magnetic field and cathode radius, and examine the equilibrium beam radius. Second, the DPC computer code is used to calculate the brightness of two electron beam sources

  10. Hybrid diffusive/PVD treatments to improve the tribological resistance of Ti-6Al-4V.

    Science.gov (United States)

    Marin, E; Offoiach, R; Lanzutti, A; Regis, M; Fusi, S; Fedrizzi, L

    2014-01-01

    Titanium alloys are nowadays used for a wide range of biomedical applications thanks to their combination of high mechanical resistance, high corrosion resistance and biocompatibility. Nevertheless, the applicability of titanium alloys is sometimes limited due to their low microhardness and tribological resistance. Thus the titanium alloys cannot be successfully applied to prosthetic joint couplings. A wide range of surface treatments, in particular PVD coatings such as CrN and TiN, have been used in order to improve the tribological behaviour of titanium alloys. However, the low microhardness of the titanium substrate often results in coating failure due to cracks and delamination. For this reason, hybrid technologies based on diffusive treatments and subsequent PVD coatings may improve the overall coating resistance. In this work, conventional PVD coatings of CrN or TiCN, deposited on Titanium Grade 5, were characterized and then combined with a standard thermal diffusive nitriding treatment in order to improve the tribological resistance of the titanium alloys and avoid coating delamination. The different treatments were studied by means of scanning electron microscopy both on the sample surface and in cross-section. In-depth composition profiles were obtained using glow discharge optical emission spectrometry (GDOES) and localized energy dispersive X-ray diffraction on linear scan-lines. The microhardness and adhesion properties of the different treatments were evaluated using Vickers microhardness tests at different load conditions. The indentations were observed by means of SEM in order to evaluate delaminated areas and the crack's shape and density. The tribological behaviour of the different treatments was tested in dry conditions and in solution, in alternate pin-on-flat configuration, with a frequency of 0.5 Hz. After testing, the surface was investigated by means of stylus profilometry and SEM both on the surface and in cross-section. The standalone PVD

  11. Simulation of Electron Beam Trajectory of Thermionic Electron Gun Type with Pierce Electrode

    International Nuclear Information System (INIS)

    Suprapto; Djoko-SP; Djasiman

    2000-01-01

    The simulation of electron beam trajectory for electron gun of electron beam machine has been done. The simulation is carried out according to mechanical design of the electron gun. The simulation is carried out by using the software made by Andrzej Soltan Institute for Nuclear Studies, Swierk-Poland. The result obtained from simulation is approximately parallel electron beam trajectory of 20 mA beam current at 0.66 kV anode voltage, 15 mm cathode-anode distance and 67.5 o cathode angle. Arrangement of electron gun and accelerating tube with 15 kV voltage between anode and the first electrode of accelerating tube yields focus distance of 34 mm from the to cathode. To obtain the approximately parallel beam trajectory which has -0.03 o entrance angles to accelerating tube, the suitable cathode-anode voltage is 12.66 kV. With the entrance angle of -0.03 o it is expected that the electron beam can be accelerated and the beam profile has a small divergence after passing the accelerating tube. (author)

  12. Yrast spectroscopy in {sup 49-51}Ti via fusion-evaporation reaction induced by a radioactive beam

    Energy Technology Data Exchange (ETDEWEB)

    Niikura, M.; Ideguchi, E.; Michimasa, S.; Ota, S.; Shimoura, S.; Wakabayashi, Y. [University of Tokyo, Center for Nuclear Study, Wako, Saitama (Japan); Aoi, N.; Baba, H.; Fukuchi, T.; Ichikawa, Y.; Kubo, T.; Kurokawa, M.; Ohnishi, T.; Suzuki, H.; Yoshida, K. [RIKEN Nishina Center, Wako, Saitama (Japan); Iwasaki, H.; Onishi, T.K.; Suzuki, D. [University of Tokyo, Department of Physics, Tokyo (Japan); Liu, M.; Zheng, Y. [Chinese Academy of Sciences, Institute of Modern Physics, Lanzhou (China)

    2009-12-15

    In-beam {gamma} -ray spectroscopy of high-spin states in {sup 49-51}Ti was performed via the fusion-evaporation reaction using a radioactive beam. By excitation function and {gamma} - {gamma} coincidence analysis, yrast high-spin levels up to I=(21/2{sup -}),(11{sup +}),(17/2{sup -}) in {sup 49-51}Ti were determined. The levels were compared with full-pf -shell model calculation. The level structure indicates the persistency of the N=28 shell gap at yrast states in {sup 49-51}Ti. (orig.)

  13. Electron beam curing of coatings

    International Nuclear Information System (INIS)

    Schmidt, J.; Mai, H.

    1986-01-01

    Modern low-energy electron beam processors offer the possibility for high-speed curing of coatings on paper, plastics, wood and metal. Today the electron beam curing gets more importance due to the increasing environmental problems and the rising cost of energy. For an effective curing process low-energy electron beam processors as well as very reactive binders are necessary. Generally such binders consist of acrylic-modified unsaturated polyester resins, polyacrylates, urethane acrylates or epoxy acrylates and vinyl monomers, mostly multifunctional acrylates. First results on the production of EBC binders on the base of polyester resins and vinyl monomers are presented. The aim of our investigations is to obtain binders with curing doses ≤ 50 kGy. In order to reduce the curing dose we studied mixtures of resins and acrylates. (author)

  14. Electron beam processing of wastewater in Malaysia

    International Nuclear Information System (INIS)

    Zulkafli Ghazali; Khairul Zaman Dahlan; Ting Teo Ming; Khomsaton A. Bakar

    2006-01-01

    Electron beam processing technology started in Malaysia in 1991 when two accelerators were installed through JICA cooperation to perform medical product sterilization project. Since then several private companies have installed electron accelerators to develop in removing volatile organic materials and to demonstrate flue gas treatment. In this country report, effort on electron beam processing of wastewater or contaminated groundwater is presented: After de-coloration tests using gamma rays as function of radiation doses, electron beam treatment of textile industry wastewater as function of beam energy and current intensity as well as with combined treatment such as aeration or biological treatment to examine the effectiveness in color and BOD or COD change has been carried out and the main results are reported. Furthermore, the present technique was examined to apply in river water treatment for use as drinking water. Techno-economic feasibility study for recycling of industrial waste water using electron beam technology is now underway. (S. Ohno)

  15. Electron beam diagnostic system using computed tomography and an annular sensor

    Science.gov (United States)

    Elmer, John W.; Teruya, Alan T.

    2014-07-29

    A system for analyzing an electron beam including a circular electron beam diagnostic sensor adapted to receive the electron beam, the circular electron beam diagnostic sensor having a central axis; an annular sensor structure operatively connected to the circular electron beam diagnostic sensor, wherein the sensor structure receives the electron beam; a system for sweeping the electron beam radially outward from the central axis of the circular electron beam diagnostic sensor to the annular sensor structure wherein the electron beam is intercepted by the annular sensor structure; and a device for measuring the electron beam that is intercepted by the annular sensor structure.

  16. Electron beam processing of polymers

    International Nuclear Information System (INIS)

    Silva, Leonardo G. Andrade e; Dias, Djalma B.; Calvo, Wilson A.P.; Miranda, Leila F. de

    2011-01-01

    The aim of this work is the use of electron beam produced by industrial electron accelerators to process polymers. There are several applications, such as, irradiation of wires and electric cables for automotive, aerospace, household appliance, naval and computing industries. The effect of different radiation doses in low density polyethylene (LDPE) was also studied. After irradiation and crosslinking it was thermally expanded forming LDPE foam. In addition, poly(N-vinyl-2-pyrrolidone) (PVP) hydrogels using electron beam processing were prepared. In all cases studied crosslinking percentages of the samples were determined. (author)

  17. Beam-ripple monitor with secondary electrons

    International Nuclear Information System (INIS)

    Sato, Shinji; Kanazawa, Mitsutaka; Noda, Koji; Takada, Eiichi; Komiyama, Akihito; Ichinohe, Ken-ichi; Sano, Yoshinobu

    1997-01-01

    To replace the scintillation-ripple monitor, we have developed a new monitor with a smaller destructive effect on the beam. In this monitor, we use secondary electrons emitted from an aluminum foil with a thickness of 2 μm. The signals of secondary electrons are amplified by an electron multiplier having a maximum gain of 10 6 . By using the new monitor, we could clearly observe the beam ripple with a beam intensity of 3.6x10 8 pps (particle per second). This monitor can also be used as an intensity monitor in the range of 10 4 - 10 9 pps. (author)

  18. Production of ion beam by conical pinched electron beam diode

    International Nuclear Information System (INIS)

    Matsukawa, Y.; Nakagawa, Y.

    1982-01-01

    Some properties of the ion beam produced by pinched electron beam diode having conical shape electrodes and organic insulator anode was studied. Ion energy is about 200keV and the peak diode current is about 30 kA. At 11cm from the diode apex, not the geometrical focus point, concentrated ion beam was obtained. Its density is more than 500A/cm 2 . The mean ion current density within the radius of 1.6cm around the axis from conical diode is two or three times that from an usual pinched electron beam diode with flat parallel electrodes of same dimension and impedance under the same conditions. (author)

  19. Effect of electron beam on the properties of electron-acoustic rogue waves

    Science.gov (United States)

    El-Shewy, E. K.; Elwakil, S. A.; El-Hanbaly, A. M.; Kassem, A. I.

    2015-04-01

    The properties of nonlinear electron-acoustic rogue waves have been investigated in an unmagnetized collisionless four-component plasma system consisting of a cold electron fluid, Maxwellian hot electrons, an electron beam and stationary ions. It is found that the basic set of fluid equations is reduced to a nonlinear Schrodinger equation. The dependence of rogue wave profiles and the associated electric field on the carrier wave number, normalized density of hot electron and electron beam, relative cold electron temperature and relative beam temperature are discussed. The results of the present investigation may be applicable in auroral zone plasma.

  20. The operational procedure of an electron beam accelerator

    International Nuclear Information System (INIS)

    Lee, Byung Cheol; Choi, Hwa Lim; Yang, Ki Ho; Han, Young Hwan; Kim, Sung Chan

    2008-12-01

    The KAERI(Korea Atomic Energy of Research Institute) high-power electron beam irradiation facility, operating at the energies between 0.3 MeV and 10 MeV, has provided irradiation services to users in industries, universities, and institute in various fields. This manual is for the operation of an electron beam which is established in KAERI, and describes elementary operation procedures of electron beam between 0.3 Mev and 10 MeV. KAERI Electron Accelerator facility(Daejeon, Korea) consists of two irradiators: one is a low-energy electron beam irradiator operated by normal conducting RF accelerator, the other is medium-energy irradiator operated by superconducting RF accelerator. We explain the check points of prior to operation, operation procedure of this facility and the essential parts of electron beam accelerator

  1. The operational procedure of an electron beam accelerator

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Byung Cheol; Choi, Hwa Lim; Yang, Ki Ho; Han, Young Hwan; Kim, Sung Chan

    2008-12-15

    The KAERI(Korea Atomic Energy of Research Institute) high-power electron beam irradiation facility, operating at the energies between 0.3 MeV and 10 MeV, has provided irradiation services to users in industries, universities, and institute in various fields. This manual is for the operation of an electron beam which is established in KAERI, and describes elementary operation procedures of electron beam between 0.3 Mev and 10 MeV. KAERI Electron Accelerator facility(Daejeon, Korea) consists of two irradiators: one is a low-energy electron beam irradiator operated by normal conducting RF accelerator, the other is medium-energy irradiator operated by superconducting RF accelerator. We explain the check points of prior to operation, operation procedure of this facility and the essential parts of electron beam accelerator.

  2. Ferromagnetic resonance response of electron-beam patterned arrays of ferromagnetic nanoparticles

    Science.gov (United States)

    Jung, Sukkoo; Watkins, Byron; Feller, Jeffrey; Ketterson, John; Chandrasekhar, Venkat

    2001-03-01

    We report on the fabrication and the dynamic magnetic properties of periodic permalloy dot arrays. Electron-beam lithography and e-gun evaporation have been used to make the arrays with the aspect ratio of 2 (dot diameter : 40 nm, height : 80 nm) and periods of 100 - 200 nm. The magnetic properties of the arrays and their interactions have been investigated by ferromagnetic resonance (FMR), magnetic force microscopy (MFM), and SQUID magnetometry. The measured FMR data show that the position and magnitude of resonant absorption peaks strongly depend on the angle between magnetic field and the lattice structure. The results of dot arrays with various kinds of structural parameters will be presented. Supported by Army Research Office, DAAD19-99-1-0334/P001

  3. Beam-beam interaction in high energy linear electron-positron colliders

    International Nuclear Information System (INIS)

    Ritter, S.

    1985-04-01

    The interaction of high energy electron and positron beams in a linear collider has been investigated using a macroparticle Monte Carlo method based on a Cloud-In-Cells plasma simulation scheme. Density evolutions, luminosities, energy and angular distributions for electrons (positrons) and synchrotron photons are calculated. Beside beams with a symmetric transverse profile also flat beams are considered. A reasonably good agreement to alternative computer calculations as well as to an analytical approximation for the energy spectrum of synchrotron photons has been obtained. (author)

  4. Buildup of electrons with hot electron beam injection into a homogeneous magnetic field

    International Nuclear Information System (INIS)

    Bashko, V.A.; Krivoruchko, A.M.; Tarasov, I.K.

    1989-01-01

    The injection of the monoenergetic beam of electrons into the vacuum drift channel under the conditions when the beam current exceeds a certain threshold value involves a virtual cathode creation. The process of virtual cathode creation leads to an exchange of one-fluid movement of beam particles to three-fluid one corresponding to incident, reflected and passed through anticathode beam particles. For the monoenergetic beam case when the velocity spread Δv dr (v dr is the beam drift velocity), the beam instability was predicted in theory and was observed in experiment. Meanwhile, the injection in the drift space of the 'hot' beam having finite spread in velocities may be accompanied not only by the reflection of particles if their velocity v 1/2 (where φ is the electrostatic potential dip value, e and m are the electron charge and mass, respectively), but also the mutual Coulomb scattering of incident and reflected electrons. The scattering process leads in its turn to appearance of viscosity forces and to trapping of a part of beam electrons into the effective potential well formed by electrostatic potential dip and the viscous force potential. The interaction of travelling and trapped particles may occur even at the stage preceding the virtual electrode formation and it may influence the process of its appearance and also the current flow through the drift space. In this report there are described the experimental results on accumulation of electrons when electron beam propagates in vacuum and has a large spread in particle velocities Δv dr in the homogeneous longitudinal magnetic field when ω pe He where ω pe is the electron Langmuir frequency of beam electrons, ω He is the electron cyclotron frequency. (author) 6 refs., 2 figs

  5. Electron beam generation in z-pinch discharges

    Energy Technology Data Exchange (ETDEWEB)

    Vikhrev, V.V.; Baronova, E.O. [Kurchatov Inst., Moscow (Russian Federation). Russian Research Center

    1997-12-31

    Numerical modelling of the process of electron beam generation in z-pinch discharges are presented. The proposed model represents the electron beam generation under turbulent plasma conditions. Strong current distribution inhomogeneity in the plasma column and the zigzag drift current motion through the plasma have accounted for the adequate generation process investigation. Electron beam is generated near the maximum of compression and it is not related with the current break effect. (author)

  6. A simple electron-beam lithography system

    DEFF Research Database (Denmark)

    Mølhave, Kristian; Madsen, Dorte Nørgaard; Bøggild, Peter

    2005-01-01

    A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit...... of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can...... be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved....

  7. Ion accumulation and space charge neutralization in intensive electron beams for ion sources and electron cooling

    International Nuclear Information System (INIS)

    Shirkov, G.D.

    1996-01-01

    The Electron Beam Ion Sources (EBIS), Electron Beam Ion Traps (EBIT) and electron beams for electron cooling application have the beam parameters in the same ranges of magnitudes. EBIS and EBIT produce and accumulate ions in the beam due to electron impact ionization. The cooling electron beam accumulates positive ions from the residual gas in the accelerator chamber during the cooling cycle. The space charge neutralization of cooling beam is also used to reduce the electron energy spread and enhance the cooling ability. The advanced results of experimental investigations and theoretical models of the EBIS electron beams are applied to analyze the problem of beam neutralization in the electron cooling techniques. The report presents the analysis of the most important processes connected with ion production, accumulation and losses in the intensive electron beams of ion sources and electron cooling systems for proton and ion colliders. The inelastic and elastic collision processes of charged particles in the electron beams are considered. The inelastic processes such as ionization, charge exchange and recombination change the charge states of ions and neutral atoms in the beam. The elastic Coulomb collisions change the energy of particles and cause the energy redistribution among components in the electron-ion beams. The characteristic times and specific features of ionization, beam neutralization, ion heating and loss in the ion sources and electron cooling beams are determined. The dependence of negative potential in the beam cross section on neutralization factor is studied. 17 refs., 5 figs., 1 tab

  8. Coulomb-Driven Relativistic Electron Beam Compression.

    Science.gov (United States)

    Lu, Chao; Jiang, Tao; Liu, Shengguang; Wang, Rui; Zhao, Lingrong; Zhu, Pengfei; Xiang, Dao; Zhang, Jie

    2018-01-26

    Coulomb interaction between charged particles is a well-known phenomenon in many areas of research. In general, the Coulomb repulsion force broadens the pulse width of an electron bunch and limits the temporal resolution of many scientific facilities such as ultrafast electron diffraction and x-ray free-electron lasers. Here we demonstrate a scheme that actually makes use of the Coulomb force to compress a relativistic electron beam. Furthermore, we show that the Coulomb-driven bunch compression process does not introduce additional timing jitter, which is in sharp contrast to the conventional radio-frequency buncher technique. Our work not only leads to enhanced temporal resolution in electron-beam-based ultrafast instruments that may provide new opportunities in probing material systems far from equilibrium, but also opens a promising direction for advanced beam manipulation through self-field interactions.

  9. Coulomb-Driven Relativistic Electron Beam Compression

    Science.gov (United States)

    Lu, Chao; Jiang, Tao; Liu, Shengguang; Wang, Rui; Zhao, Lingrong; Zhu, Pengfei; Xiang, Dao; Zhang, Jie

    2018-01-01

    Coulomb interaction between charged particles is a well-known phenomenon in many areas of research. In general, the Coulomb repulsion force broadens the pulse width of an electron bunch and limits the temporal resolution of many scientific facilities such as ultrafast electron diffraction and x-ray free-electron lasers. Here we demonstrate a scheme that actually makes use of the Coulomb force to compress a relativistic electron beam. Furthermore, we show that the Coulomb-driven bunch compression process does not introduce additional timing jitter, which is in sharp contrast to the conventional radio-frequency buncher technique. Our work not only leads to enhanced temporal resolution in electron-beam-based ultrafast instruments that may provide new opportunities in probing material systems far from equilibrium, but also opens a promising direction for advanced beam manipulation through self-field interactions.

  10. Measurement of electron beams profile of pierce type electron source using sensor of used Tv tube

    International Nuclear Information System (INIS)

    Darsono; Suhartono; Suprapto; Elin Nuraini

    2015-01-01

    The measurement of an electron beam profile has been performed using electron beam monitor based on method of phosphorescent materials. The main components of the electron beam monitor consists of a fluorescent sensor using a used Tv tube, CCTV camera to record images on a Tv screen, video adapter as interface between CCTV and laptop, and the laptop as a viewer and data processing. Two Pierce-type electron sources diode and triode was measured the shape of electron beam profile in real time. Results of the experiments showed that the triode electron source of Pierce type gave the shape of electron beam profiles better than that of the diode electron source .The anode voltage is not so influential on the beam profile shape. The focused voltage in the triode electron source is so influence to the shape of the electron beam profile, but above 5 kV no great effect. It can be concluded that the electron beam monitor can provide real time observations and drawings shape of the electron beam profile displayed on the used Tv tube glass screen which is the real picture of the shape of the electron beam profile. Triode electron source produces a better electron beam profile than that of the diode electron source. (author)

  11. Electron beam cladding of titanium on stainless steel plate

    International Nuclear Information System (INIS)

    Tomie, Michio; Abe, Nobuyuki; Yamada, Masanori; Noguchi, Shuichi.

    1990-01-01

    Fundamental characteristics of electron beam cladding was investigated. Titanium foil of 0.2mm thickness was cladded on stainless steel plate of 3mm thickness by scanning electron beam. Surface roughness and cladded layer were analyzed by surface roughness tester, microscope, scanning electron microscope and electron probe micro analyzer. Electron beam conditions were discussed for these fundamental characteristics. It is found that the energy density of the electron beam is one of the most important factor for cladding. (author)

  12. Electron beam halo monitor for a compact x-ray free-electron laser

    Directory of Open Access Journals (Sweden)

    Hideki Aoyagi

    2013-03-01

    Full Text Available An electron beam halo monitor using diamond-based detectors, which are operated in the ionization mode, has been developed for the SPring-8 Angstrom compact free-electron laser (SACLA to protect its undulator magnets from radiation damage. Diamond-based detectors are inserted in a beam duct to measure the intensity of the beam halo directly. To suppress the degradation of the electron beam due to the installation of the beam halo monitor, rf fingers with aluminum windows are newly employed. We evaluated the effect of radiation from the Al windows on the output signal both experimentally and by simulation. The operational results of the beam halo monitor employed in SACLA are presented.

  13. Electron-beam and microwave treatment of some microbial strains

    International Nuclear Information System (INIS)

    Martin, D.; Ferdes, O.S.; Minea, R.; Tirlea, A.; Badea, M.; Plamadeala, S.; Ferdes, M.

    1998-01-01

    The experimental results concerning the combined effects of microwaves and accelerated electron beams on various microbial strains such as E. coli, Salmonella sp. and Monascus purpureus are presented. A special designed microwave applicator with a 2.45 GHz frequency CW magnetron of 850 maximum output power and with associate electronics that allow to control the microwave power, the current intensity, and the exposure time was used. The electron-beam irradiation was performed at different irradiation doses and at a dose rate of 1.5 - 2.0 kGy/min by using a linac at a mean electron energy about 6 MeV, mean bean current of 10 μA, pulse period of 3.5 μs and repetition frequency 100 Hz. The experiments were carried out in 5 variants: microwave treatment; electron-beam irradiation; microwaves followed by electron beam; electrons followed by microwaves; and simultaneous application of microwaves and electron beam. The microbiocidal effect was found to be enhanced by additional use of microwave energy to electron beam irradiation. Enhancement of inactivation rate is only remarkable for the microwave treatment or simultaneous electron beam and microwave irradiation at a temperature above the critical value at which microorganisms begin to perish by heat. Simultaneous irradiation with electron beam and microwaves results in a reduction of temperature and time as well as in the decrease of the upper limit of required electron beam absorbed dose for an assumed microbiological quality parameter. The results obtained indicate the occurrence of a synergistic effect of the two physical fields on a non-thermal basis. Hence, combined microwave-electron beam treatment may be applied as an effective method to reduce microbial load

  14. Beam characterization at BATMAN for variation of the Cs evaporation asymmetry and comparing two driver geometries

    Science.gov (United States)

    Aza, E.; Schiesko, L.; Wimmer, C.; Wünderlich, D.; Fantz, U.

    2017-08-01

    The properties of the negative hydrogen ion beam produced by the scaled prototype ITER NBI source at the BATMAN testbed were investigated by means of two beam diagnostics: Beam Emission Spectroscopy (BES) and a calorimeter. Two modifications to the prototype were applied. The first was the installation of a second Cs oven at the bottom part of the backplate in addition to the standard one at the upper part of the backplate varying the Cs evaporation asymmetry inside the source. The second consisted in the replacement of the cylindrical driver with a larger racetrack-shaped RF driver and placing a single Cs oven in a central position at the backplate of the driver. The resulting beam characteristics are discussed and compared with those obtained with the previous source design. The position of the Cs oven and the different driver size and geometry appear not to influence the beam profile and the beam deflection for a well-conditioned source.

  15. Generation of Low-Energy High-Current Electron Beams in Plasma-Anode Electron Guns

    Science.gov (United States)

    Ozur, G. E.; Proskurovsky, D. I.

    2018-01-01

    This paper is a review of studies on the generation of low-energy high-current electron beams in electron guns with a plasma anode and an explosive-emission cathode. The problems related to the initiation of explosive electron emission under plasma and the formation and transport of high-current electron beams in plasma-filled systems are discussed consecutively. Considerable attention is given to the nonstationary effects that occur in the space charge layers of plasma. Emphasis is also placed on the problem of providing a uniform energy density distribution over the beam cross section, which is of critical importance in using electron beams of this type for surface treatment of materials. Examples of facilities based on low-energy high-current electron beam sources are presented and their applications in materials science and practice are discussed.

  16. Achromatic and isochronous electron beam transport for tunable free electron lasers

    International Nuclear Information System (INIS)

    Bengtsson, J.; Kim, K.J.

    1991-09-01

    We have continued the study of a suitable electron beam transport line, which is both isochronous and achromatic, for the free electron laser being designed at Lawrence Berkeley Laboratory. A refined version of the beam transport optics is discussed that accommodates two different modes of FEL wavelength tuning. For the fine tuning involving a small change of the electron beam energy, sextupoles are added to cancel the leading nonlinear dispersion. For the main tuning involving the change of the undulator gap, a practical solution of maintaining the beam matching condition is presented. Calculation of the higher order aberrations is facilitated by a newly developed code. 11 refs., 4 figs., 3 tabs

  17. Electron beam depolarization in a damping ring

    International Nuclear Information System (INIS)

    Minty, M.

    1993-04-01

    Depolarization of a polarized electron beam injected into a damping ring is analyzed by extending calculations conventionally applied to proton synchrotrons. Synchrotron radiation in an electron ring gives rise to both polarizing and depolarizing effects. In a damping ring, the beam is stored for a time much less than the time for self polarization. Spin flip radiation may therefore be neglected. Synchrotron radiation without spin flips, however, must be considered as the resonance strength depends on the vertical betatron oscillation amplitude which changes as the electron beam is radiation damped. An expression for the beam polarization at extraction is derived which takes into account radiation damping. The results are applied to the electron ring at the Stanford Linear Collider and are compared with numerical matrix formalisms

  18. Prevalence of early and late stages of physiologic PVD in emmetropic elderly population.

    Science.gov (United States)

    Schwab, Christoph; Ivastinovic, Domagoj; Borkenstein, Andreas; Lackner, Eva-Maria; Wedrich, Andreas; Velikay-Parel, Michaela

    2012-05-01

    To investigate the early and late stages of posterior vitreous detachment (PVD) in the foveal area in correlation with age and gender. Three hundred and thirty-five emmetropic eyes of 271 Caucasian patients (216 women/119 men) were examined by optical coherence tomography (OCT) and ultrasound (US). Eyes were classified into groups according to the patients age (up to 69.9; 70-74.9; 75-79.9; over 80 years) and to the clinical findings [Vitreous state: Detached in US; Detached in OCT; Foveal adhesion (FA); Attached vitreous]. The mean age was 76 ± 8 ranging from 44 to 89 years in female and 72 ± 10 ranging from 46 to 87 years in male subjects. The vitreous was attached in 32% of all eyes, 18.5% had FA, 18.5% were detached in OCT and 68% were detached in US. While prevalence of FA decreases with increasing age, OCT-diagnosed detachments did not change significantly with age. Between the ages of 70 and 75, an increase in PVD rates occurred. The prevalence of PVD was similar in both genders. Women were significantly older than men in the late-stage PVD in the eyes. The use of OCT and US enabled us to detect a partial or total PVD in 80% of the eyes. A sudden increase in late-stage PVD between the ages of 70 and 75 was observed, correlating with the reported age prevalence of various macular diseases. In contrast to myopics, both genders of elderly emmetropics have a similar prevalence of PVD. © 2011 The Authors. Acta Ophthalmologica © 2011 Acta Ophthalmologica Scandinavica Foundation.

  19. Modular low-voltage electron beams

    Science.gov (United States)

    Berejka, Anthony J.; Avnery, Tovi; Carlson, Carl

    2004-09-01

    Modular, low-voltage systems have simplified electron beam (EB) technology for industrial uses and for research and development. Modular EB units are produced in quantity as sealed systems that are evacuated at the factory eliminating the need for vacuum pumps at the point of use. A simple plug-out—plug-in method of replacement eliminates downtime for servicing. Use of ultra-thin beam windows (innovative design to extract and spread the beam (enabling systems to be placed adjacent to each other to extend beam width) and touch-screen computer controls, combine for ease of use and electrical transfer efficiency at voltages that can be varied between 80 and 150 kV and with high beam currents (up to 40 mA across the 25 cm window). These electron systems are available in three widths, the standard 25 cm and new 5 and 40 cm beams. Traditional uses in the graphic arts and coatings areas as well as uses in surface sterilization have found these compact, lightweight (approximately 15 kg) modular beams of interest. Units have been configured around complex shapes to enable three-dimensional surface curing (as for coatings on aluminum tubing) to be achieved at high production rates. Details of the beam construction and some industrial uses are discussed.

  20. Regenerative beam breakup in multi-pass electron accelerators

    International Nuclear Information System (INIS)

    Vetter, A.M. Jr.

    1980-01-01

    Important electron coincidence experiments in the 1 to 2 GeV range require electron beams of high intensity and high duty factor. To provide such beams, multi-pass electron accelerator systems are being developed at many laboratories. The beam current in multi-pass electron machines is limited by bean breakup which arises from interaction of the electron beam with deflection modes of the accelerator structure. Achieving high beam intensity (50 to 100 μA) will require detailed understanding and careful control of beam breakup phenomena, and is the subject of this thesis. The TM 11 -like traveling wave theory is applied to obtain a physical understanding of beam-mode interactions and the principles of focussing in simple two-pass systems, and is used as a basis for general studies of the dependence of starting current on accelerator parameters in systems of many passes. The concepts developed are applied in analyzing beam breakup in the superconducting recyclotron at Stanford. Measurements of beam interactions with selected breakup modes are incorporated in a simple model in order to estimate relative strengths of breakup modes and to predict starting currents in five-pass operation. The improvement over these predicted currents required in order to obtain 50 to 100 μA beams is shown to be achievable with a combination of increased breakup mode loading and improved beam optics

  1. Innovative energy efficient low-voltage electron beam emitters

    International Nuclear Information System (INIS)

    Felis, Kenneth P.; Avnery, Tovi; Berejka, Anthony J.

    2002-01-01

    Advanced electron beams (AEB) has developed a modular, low voltage (80-125 keV), high beam current (up to 40 ma), electron emitter with typically 25 cm of beam width, that is housed in an evacuated, returnable chamber that is easy to plug in and connect. The latest in nanofabrication enables AEB to use an ultra-thin beam window. The power supply for AEB's emitter is based on solid-state electronics. This combination of features results in a remarkable electrical efficiency. AEB's electron emitter relies on a touch screen, computer control system. With 80 μm of unit density beam penetration, AEB's electron emitter has gained market acceptance in the curing of opaque, pigmented inks and coatings used on flexible substrates, metals and fiber composites and in the curing of adhesives in foil based laminates

  2. Innovative energy efficient low-voltage electron beam emitters

    Science.gov (United States)

    Felis, Kenneth P.; Avnery, Tovi; Berejka, Anthony J.

    2002-03-01

    Advanced electron beams (AEB) has developed a modular, low voltage (80-125 keV), high beam current (up to 40 ma), electron emitter with typically 25 cm of beam width, that is housed in an evacuated, returnable chamber that is easy to plug in and connect. The latest in nanofabrication enables AEB to use an ultra-thin beam window. The power supply for AEB's emitter is based on solid-state electronics. This combination of features results in a remarkable electrical efficiency. AEB's electron emitter relies on a touch screen, computer control system. With 80 μm of unit density beam penetration, AEB's electron emitter has gained market acceptance in the curing of opaque, pigmented inks and coatings used on flexible substrates, metals and fiber composites and in the curing of adhesives in foil based laminates.

  3. Effect of beam oscillation on borated stainless steel electron beam welds

    Energy Technology Data Exchange (ETDEWEB)

    RajaKumar, Guttikonda [Tagore Engineering College, Chennai (India). Dept. of Mechanical Engineering; Ram, G.D. Janaki [Indian Institute of Technology (IIT), Chennai (India). Dept. of Metallurgical and Materials Engineering; Rao, S.R. Koteswara [SSN College of Engineering, Chennai (India). Mechanical Engineering

    2015-07-01

    Borated stainless steels are used in nuclear power plants to control neutron criticality in reactors as control rods, shielding material, spent fuel storage racks and transportation casks. In this study, bead on plate welds were made using gas tungsten arc welding (GTAW) and electron beam welding (EBW) processes. Electron beam welds made using beam oscillation technique exhibited higher tensile strength values compared to that of GTA welds. Electron beam welds were found to show fine dendritic microstructure while GTA welds exhibited larger dendrites. While both processes produced defect free welds, GTA welds are marked by partially melted zone (PMZ) where the hardness is low. EBW obviate the PMZ failure due to low heat input and in case of high heat input GTA welding process failure occurs in the PMZ.

  4. Effect of beam oscillation on borated stainless steel electron beam welds

    International Nuclear Information System (INIS)

    RajaKumar, Guttikonda; Ram, G.D. Janaki; Rao, S.R. Koteswara

    2015-01-01

    Borated stainless steels are used in nuclear power plants to control neutron criticality in reactors as control rods, shielding material, spent fuel storage racks and transportation casks. In this study, bead on plate welds were made using gas tungsten arc welding (GTAW) and electron beam welding (EBW) processes. Electron beam welds made using beam oscillation technique exhibited higher tensile strength values compared to that of GTA welds. Electron beam welds were found to show fine dendritic microstructure while GTA welds exhibited larger dendrites. While both processes produced defect free welds, GTA welds are marked by partially melted zone (PMZ) where the hardness is low. EBW obviate the PMZ failure due to low heat input and in case of high heat input GTA welding process failure occurs in the PMZ.

  5. Free-electron laser beam

    International Nuclear Information System (INIS)

    Minehara, Eisuke

    2003-01-01

    The principle and history of free-electron laser (FEL), first evidenced in 1977, the relationship between FEL wavelength and output power, the high-power FEL driven by the superconducting linac, the X-ray FEL by the linac, and the medical use are described. FEL is the vacuum oscillator tube and essentially composed from the high-energy linac, undulator and light-resonator. It utilizes free electrons in the vacuum to generate the beam with wavelength ranging from microwave to gamma ray. The first high-power FEL developed in Japanese Atomic Energy Research Institute (JAERI) is based on the development of superconducting linac for oscillating the highest power beam. In the medical field, applications to excise brain tumors (in US) and to reconstruct experimentally blood vessels in the pig heart (in Gunma University) by lasing and laser coagulator are in progress with examinations to remove intra-vascular cholesterol mass by irradiation of 5.7μm FEL beam. Cancer cells are considered diagnosed by FEL beam of far-infrared-THz range. The FEL beam CT is expected to have a wide variety of application without the radiation exposure and its resolution is equal or superior to that of usual imaging techniques. (N.I.)

  6. Formation of scandium nitride (ScN) layer on gallium arsenide (GaAs) substrate using a combined technique of e-beam evaporator and ammonia annealing treatment

    Energy Technology Data Exchange (ETDEWEB)

    Yong Shee Meng, Alvin [Institute of Nano Optoelectronics Research and Technology (INOR), sains@usm, Persiaran Bukit Jambul, 11900 Bayan Lepas, Penang (Malaysia); Zainal, Norzaini, E-mail: norzaini@usm.my [Nano Optoelectronics Research and Laboratory, Universiti Sains Malaysia, sains@usm, Persiaran Bukit Jambul, 11900, Bayan Lepas, Penang (Malaysia); Hassan, Zainuriah; Ibrahim, Kamarulazizi [Institute of Nano Optoelectronics Research and Technology (INOR), sains@usm, Persiaran Bukit Jambul, 11900 Bayan Lepas, Penang (Malaysia)

    2015-12-30

    Graphical abstract: - Highlights: • Forming ScN layer using electron e-beam evaporator with successive NH{sub 3} annealing thermal has been successfully demonstrated. • NH{sub 3} annealing played the role in changing the grain structure of the ScN layer. • The existence of Sc−N bonds was confirmed by XPS measurement. • The 900 °C annealed ScN layer showed the best structural and optical characteristics. • ScN layer annealed at 980 °C exhibited poor structural and optical characteristics. - Abstract: A demonstration on a new technique of growing ScN using electron beam (e-beam) evaporator, coupled with successive ammonia (NH{sub 3}) annealing treatment is presented in this paper. The annealing temperature was varied at 750, 800, 850, 900 and 980 °C in order to obtain the best ScN layer. It was found that as the annealing temperature increased, the surface morphology of the ScN layer changed and ScN grains formed abundantly on the surface. The best surface of ScN layer was found in the 900 °C annealed sample. However, the roughness of the ScN increased with temperature. The photoluminescence (PL) peak of the near-to-band-edge (NBE) of ScN was observable in all samples and its intensity was the highest in the 900 °C annealed sample. Note that when the annealing treatment was conducted at 980 °C, the GaN PL peak is observable. Raman peaks of TO(X) of ScN were much evident at the annealing temperature above 900 °C. The formation of Sc−N bonds was confirmed by X-ray spectroscopy (XPS) measurement. In the end of this work, we propose that the formation of ScN using the above techniques was successful, with thermal annealing at the temperature of 900 °C.

  7. Formation of scandium nitride (ScN) layer on gallium arsenide (GaAs) substrate using a combined technique of e-beam evaporator and ammonia annealing treatment

    International Nuclear Information System (INIS)

    Yong Shee Meng, Alvin; Zainal, Norzaini; Hassan, Zainuriah; Ibrahim, Kamarulazizi

    2015-01-01

    Graphical abstract: - Highlights: • Forming ScN layer using electron e-beam evaporator with successive NH_3 annealing thermal has been successfully demonstrated. • NH_3 annealing played the role in changing the grain structure of the ScN layer. • The existence of Sc−N bonds was confirmed by XPS measurement. • The 900 °C annealed ScN layer showed the best structural and optical characteristics. • ScN layer annealed at 980 °C exhibited poor structural and optical characteristics. - Abstract: A demonstration on a new technique of growing ScN using electron beam (e-beam) evaporator, coupled with successive ammonia (NH_3) annealing treatment is presented in this paper. The annealing temperature was varied at 750, 800, 850, 900 and 980 °C in order to obtain the best ScN layer. It was found that as the annealing temperature increased, the surface morphology of the ScN layer changed and ScN grains formed abundantly on the surface. The best surface of ScN layer was found in the 900 °C annealed sample. However, the roughness of the ScN increased with temperature. The photoluminescence (PL) peak of the near-to-band-edge (NBE) of ScN was observable in all samples and its intensity was the highest in the 900 °C annealed sample. Note that when the annealing treatment was conducted at 980 °C, the GaN PL peak is observable. Raman peaks of TO(X) of ScN were much evident at the annealing temperature above 900 °C. The formation of Sc−N bonds was confirmed by X-ray spectroscopy (XPS) measurement. In the end of this work, we propose that the formation of ScN using the above techniques was successful, with thermal annealing at the temperature of 900 °C.

  8. Review of electron beam therapy physics

    International Nuclear Information System (INIS)

    Hogstrom, Kenneth R; Almond, Peter R

    2006-01-01

    For over 50 years, electron beams have been an important modality for providing an accurate dose of radiation to superficial cancers and disease and for limiting the dose to underlying normal tissues and structures. This review looks at many of the important contributions of physics and dosimetry to the development and utilization of electron beam therapy, including electron treatment machines, dose specification and calibration, dose measurement, electron transport calculations, treatment and treatment-planning tools, and clinical utilization, including special procedures. Also, future changes in the practice of electron therapy resulting from challenges to its utilization and from potential future technology are discussed. (review)

  9. Electron beam accelerator facilities at IPEN-CNEN/SP

    Energy Technology Data Exchange (ETDEWEB)

    Somessari, Samir L.; Silveira, Carlos G. da; Paes, Helio; Somessari, Elizabeth S.R. [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil)], E-mail: somessar@ipen.br

    2007-07-01

    Electron beam processing is a manufacturing technique, which applies a focused beam of high-energy electrons produced by an electron accelerator to promote chemical changes within a product. At IPEN-CNEN/SP there are two electron beam accelerators Type Dynamitron{sup R} (manufactured by RDI- Radiation Dynamics Inc.) Job 188 and Job 307 models. The technical specifications for the Job 188 energy 1.5 MeV, beam current 25 mA, scan 1.20 m, beam power 37.5 kW and for the Job 307 energy 1.5 MeV, beam current 65 mA, Scan 1.20 m, beam power 97.5 kW. Some applications of the electron beam accelerator for radiation processing are wire and cable insulation crosslinking, rubber vulcanization, sterilization and disinfection of medical products, food preservation, heat shrinkable products, polymer degradation, aseptic packaging, semiconductors and pollution control. For irradiating these materials at IPEN-CNEN/SP, there are some equipment such as, underbeam capstan with speed control from 10 to 700 m/min; a track; a system to roll up and unroll wires and electric cables, polyethylene blankets and other systems to improve the quality of the products. (author)

  10. Study on the compensation of electron beam space charge in facilittes with electron cooling

    International Nuclear Information System (INIS)

    Dikanskij, N.S.; Kudelajnen, V.I.; Parkhomchuk, V.V.; Pestrikov, D.V.

    1981-01-01

    The results of experimental investigations of a compensated electron beam on the NAP-M facility are presented. The electron beam is compensated by electrostatic plugs preventing ion leakage along the beam. Cut-off electrodes have the shape of cutted cylinders encircling the electron beam. To eliminate electron accumulation around the plugs one of the electrodes has a zero potential, which results in formation of an transverse electric field causing ionization electron drift in the transverse direction to the electric and magnetic fields. The effect of wave damping, in the compensated beam is observed, that demonstrates the possibility of gaining great current densities in long compensated beams necessary for antiproton storage. For the NAP-M at the 10 10 cm/s electron velocity, 300 cm length of ion column, and 1 kOe field intensity the threshold beam current density is 0.96 A/cm 2 [ru

  11. Electron beam influence on the carbon contamination of electron irradiated hydroxyapatite thin films

    International Nuclear Information System (INIS)

    Hristu, Radu; Stanciu, Stefan G.; Tranca, Denis E.; Stanciu, George A.

    2015-01-01

    Highlights: • Carbon contamination mechanisms of electron-beam-irradiated hydroxyapatite. • Atomic force microscopy phase imaging used to detect carbon contamination. • Carbon contamination dependence on electron energy, irradiation time, beam current. • Simulation of backscattered electrons confirms the experimental results. - Abstract: Electron beam irradiation which is considered a reliable method for tailoring the surface charge of hydroxyapatite is hindered by carbon contamination. Separating the effects of the carbon contamination from those of irradiation-induced trapped charge is important for a wide range of biological applications. In this work we focus on the understanding of the electron-beam-induced carbon contamination with special emphasis on the influence of the electron irradiation parameters on this phenomenon. Phase imaging in atomic force microscopy is used to evaluate the influence of electron energy, beam current and irradiation time on the shape and size of the resulted contamination patterns. Different processes involved in the carbon contamination of hydroxyapatite are discussed

  12. Stability of electron-beam energy monitor for quality assurance of the electron-beam energy from radiotherapy accelerators

    International Nuclear Information System (INIS)

    Chida, Koichi; Zuguchi, Masayuki; Saito, Haruo; Takai, Yoshihiro; Mitsuya, Masatoshi; Sakakida, Hideharu; Yamada, Shogo; Kohzuki, Masahiro

    2002-01-01

    Information on electron energy is important in planning radiation therapy using electrons. The Geske 3405 electron beam energy monitor (Geske monitor, PTW Nuclear Associates, Carle Place, NY, USA) is a device containing nine ionization chambers for checking the energy of the electron beams produced by radiotherapy accelerators. We wondered whether this might increase the likelihood of ionization chamber trouble. In spite of the importance of the stability of such a quality assurance (QA) device, there are no reports on the stability of values measured with a Geske monitor. The purpose of this paper was therefore to describe the stability of a Geske monitor. It was found that the largest coefficient of variation (CV) of the Geske monitor measurements was approximately 0.96% over a 21-week period. In conclusion, the stability of Geske monitor measurements of the energy of electron beams from a linear accelerator was excellent. (author)

  13. Numerical simulation of electron beam welding with beam oscillations

    Science.gov (United States)

    Trushnikov, D. N.; Permyakov, G. L.

    2017-02-01

    This research examines the process of electron-beam welding in a keyhole mode with the use of beam oscillations. We study the impact of various beam oscillations and their parameters on the shape of the keyhole, the flow of heat and mass transfer processes and weld parameters to develop methodological recommendations. A numerical three-dimensional mathematical model of electron beam welding is presented. The model was developed on the basis of a heat conduction equation and a Navier-Stokes equation taking into account phase transitions at the interface of a solid and liquid phase and thermocapillary convection (Marangoni effect). The shape of the keyhole is determined based on experimental data on the parameters of the secondary signal by using the method of a synchronous accumulation. Calculations of thermal and hydrodynamic processes were carried out based on a computer cluster, using a simulation package COMSOL Multiphysics.

  14. Studies on functional polymer films utilizing low energy electron beam

    International Nuclear Information System (INIS)

    Ando, Masayuki

    1992-01-01

    Also in adhesives and tackifiers, with the expansion of the fields of application, the required characteristics have become high grade and complex. As one of them, the instantaneous hardening of adhesives can be taken up. In the field of lamination works, the low energy type electron beam accelerators having the linear filament of accelerating voltage below 300 kV were developed in 1970s, and the interest in the development of electron beam-handened adhesives has heightend. The authors have carried out research aiming at heightening the functions of the polymer films obtained by electron beam hardening reaction, and developed the adhesives. In this report, the features of electron beam hardening reaction, the structure and properties of electron beam-hardened polymer films and the molecular design of electron beam-hardened monomer oligomers are described. The feature of electron beam hardening reaction is the cross-linking of high degree as the structure of oligomers is maintained. By controlling the structure at the time of electron beam hardening, the heightening of the functions of electron beam-hardened polymer films is feasible. (K.I.)

  15. Landau Damping of Beam Instabilities by Electron Lenses

    Energy Technology Data Exchange (ETDEWEB)

    Shiltsev, V. [Fermilab; Alexahin, Yuri; Burov, A. [Fermilab; Valishev, A. [Fermilab

    2017-06-26

    Modern and future particle accelerators employ increasingly higher intensity and brighter beams of charged particles and become operationally limited by coherent beam instabilities. Usual methods to control the instabilities, such as octupole magnets, beam feedback dampers and use of chromatic effects, become less effective and insufficient. We show that, in contrast, Lorentz forces of a low-energy, a magnetically stabilized electron beam, or "electron lens", easily introduces transverse nonlinear focusing sufficient for Landau damping of transverse beam instabilities in accelerators. It is also important that, unlike other nonlinear elements, the electron lens provides the frequency spread mainly at the beam core, thus allowing much higher frequency spread without lifetime degradation. For the parameters of the Future Circular Collider, a single conventional electron lens a few meters long would provide stabilization superior to tens of thousands of superconducting octupole magnets.

  16. Parametric study of transport beam lines for electron beams accelerated by laser-plasma interaction

    Science.gov (United States)

    Scisciò, M.; Lancia, L.; Migliorati, M.; Mostacci, A.; Palumbo, L.; Papaphilippou, Y.; Antici, P.

    2016-03-01

    In the last decade, laser-plasma acceleration of high-energy electrons has attracted strong attention in different fields. Electrons with maximum energies in the GeV range can be laser-accelerated within a few cm using multi-hundreds terawatt (TW) lasers, yielding to very high beam currents at the source (electron bunches with up to tens-hundreds of pC in a few fs). While initially the challenge was to increase the maximum achievable electron energy, today strong effort is put in the control and usability of these laser-generated beams that still lack of some features in order to be used for applications where currently conventional, radio-frequency (RF) based, electron beam lines represent the most common and efficient solution. Several improvements have been suggested for this purpose, some of them acting directly on the plasma source, some using beam shaping tools located downstream. Concerning the latter, several studies have suggested the use of conventional accelerator magnetic devices (such as quadrupoles and solenoids) as an easy implementable solution when the laser-plasma accelerated beam requires optimization. In this paper, we report on a parametric study related to the transport of electron beams accelerated by laser-plasma interaction, using conventional accelerator elements and tools. We focus on both, high energy electron beams in the GeV range, as produced on petawatt (PW) class laser systems, and on lower energy electron beams in the hundreds of MeV range, as nowadays routinely obtained on commercially available multi-hundred TW laser systems. For both scenarios, our study allows understanding what are the crucial parameters that enable laser-plasma accelerators to compete with conventional ones and allow for a beam transport. We show that suitable working points require a tradeoff-combination between low beam divergence and narrow energy spread.

  17. Operational experience with SLAC's beam containment electronics

    International Nuclear Information System (INIS)

    Constant, T.N.; Crook, K.; Heggie, D.

    1977-03-01

    Considerable operating experience was accumulated at SLAC with an extensive electronic system for the containment of high power accelerated beams. Average beam power at SLAC can approach 900 kilowatts with the potential for burning through beam stoppers, protection collimators, and other power absorbers within a few seconds. Fast, reliable, and redundant electronic monitoring circuits have been employed to provide some of the safeguards necessary for minimizing the risk to personnel. The electronic systems are described, and the design philosophy and operating experience are discussed

  18. Applications and technology of electron beam accelerators

    International Nuclear Information System (INIS)

    Sethi, R.C.

    2005-01-01

    Traditionally, accelerators have been employed for pursuing research in basic sciences. But over the last couple of decades their uses have proliferated into the applied fields as well. The major credit for which goes to the electron beams. Electron beams or the radiations generated by them are being extensively used in almost all the applied areas. This article is a brief account of the impact made by the accelerator based electron beams and the attempts initiated by DAE for building a base in this technology. (author)

  19. Recent developments in electron beam machine technology

    International Nuclear Information System (INIS)

    Sadat, T.; Ross, A.; Leveziel, H.

    1994-01-01

    Electron beam accelerator provides ionisation energy for industrial processing. Electron beam accelerators are increasingly used for decontamination, conservation and disinfestation of food, for sterilization of medical products, and for polymerisation of materials. These machines are easy to install into a production factory as the radiation stops as soon as the machine is switched off. This safety advantage, together with the flexibility of use of these highly automated machines, has allowed the electron beam accelerator to become an important production tool. (author). 23 refs., 6 figs., 2 tabs

  20. Mechanical properties of EB-PVD ZrO2 thermal barrier coatings

    International Nuclear Information System (INIS)

    Held, Carolin

    2014-01-01

    In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

  1. Renormalization theory of beam-beam interaction in electron-positron colliders

    International Nuclear Information System (INIS)

    Chin, Y.H.

    1989-07-01

    This note is devoted to explaining the essence of the renormalization theory of beam-beam interaction for carrying out analytical calculations of equilibrium particle distributions in electron-positron colliding beam storage rings. Some new numerical examples are presented such as for betatron tune dependence of the rms beam size. The theory shows reasonably good agreements with the results of computer simulations. 5 refs., 6 figs

  2. Modular low-voltage electron beams

    International Nuclear Information System (INIS)

    Berejka, A.J.; Avnery, Tovi; Carlson, Carl

    2004-01-01

    Modular, low-voltage systems have simplified electron beam (EB) technology for industrial uses and for research and development. Modular EB units are produced in quantity as sealed systems that are evacuated at the factory eliminating the need for vacuum pumps at the point of use. A simple plug-out--plug-in method of replacement eliminates downtime for servicing. Use of ultra-thin beam windows (<10 μm of titanium foil), solid-state 19 in. (48 cm) rack-mounted power supplies, an innovative design to extract and spread the beam (enabling systems to be placed adjacent to each other to extend beam width) and touch-screen computer controls, combine for ease of use and electrical transfer efficiency at voltages that can be varied between 80 and 150 kV and with high beam currents (up to 40 mA across the 25 cm window). These electron systems are available in three widths, the standard 25 cm and new 5 and 40 cm beams. Traditional uses in the graphic arts and coatings areas as well as uses in surface sterilization have found these compact, lightweight (approximately 15 kg) modular beams of interest. Units have been configured around complex shapes to enable three-dimensional surface curing (as for coatings on aluminum tubing) to be achieved at high production rates. Details of the beam construction and some industrial uses are discussed

  3. Electron beam application in gas waste treatment in China

    International Nuclear Information System (INIS)

    Wu Haifeng

    2003-01-01

    In the most recent decade, electron beam waste treatment technology attracted serious attention from environment policymaker and industrial leaders in power industry in China. Starting in middle of 1980's, Chinese research institute began experiment of electron beam treatment on flue gas. By the end of 2000, two 10,000 cubic meters per hour small scale electron beam gas purifying station were established in Sichuang province and Beijing. Several electron beam gas purifying demonstration projects are under construction. With robust economy and strong energy demand, needless to say, in near future, electron beam gas purifying technology will have a bright prospect in China. (author)

  4. Electron Beam Diagnosis and Dynamics using DIADYN Plasma Source

    International Nuclear Information System (INIS)

    Toader, D.; Craciun, G.; Manaila, E.; Oproiu, C.; Marghitu, S.

    2009-01-01

    This paper is presenting results obtained with the DIADYN installation after replacing its vacuum electron source (VES L V) with a plasma electron source (PES L V). DIADYN is a low energy laboratory equipment operating with 10 to 50 keV electron beams and designed to help realize non-destructive diagnosis and dynamics for low energy electron beams but also to be used in future material irradiations. The results presented here regard the beam diagnosis and dynamics made with beams obtained from the newly replaced plasma source. We discuss both results obtained in experimental dynamics and dynamics calculation results for electron beams extracted from the SEP L V source.

  5. A study on the secondary electrons in a clinical electron beam

    International Nuclear Information System (INIS)

    Krithivas, G.; Rao, S.N.

    1989-01-01

    The central axis dose of a 12 MeV clinical electron beam is investigated in terms of an axial component due to primary electrons in the central ray and a lateral component due to secondary electrons originating from multiple scattering of electrons in the off-axis rays. To this effect secondary electron fluence measurements in a polystyrene medium irradiated with a collimated beam are made with a sensitive diode detector. This leads to a construction of secondary electron depth-dose profiles for beam sizes of diameters ranging from 1.7 to 17.4 cm. The results indicate that the lateral electrons account for 25% of the dose in the therapeutic region. For these electrons, the depth of dose maximum is correlated with diffusion depth and maximum lateral excursion in the medium. Dose component due to backscatter electrons at depths is also investigated using a thin-window parallel-plate ion chamber. The role of lateral and backscatter electrons in characterising central axis per cent depth-dose is discussed. (author)

  6. Development of beam diagnostic devices for characterizing electron guns

    International Nuclear Information System (INIS)

    Bhattacharjee, D.; Tiwari, R.; Jayaprakash, D.; Mishra, R.L.; Sarukte, H.; Waghmare, A.; Thakur, N.; Dixit, K.P.

    2015-01-01

    The electron guns for the DC accelerators and RF Linacs are designed and developed at EBC/APPD/BARC, Kharghar. These electron guns need to be characterized for its design and performance. Two test benches were developed for characterizing the electron guns. Various beam diagnostic devices for measuring beam currents and beam sizes were developed. Conical faraday cup, segmented faraday cup, slit scanning bellows movement arrangement, multi-plate beam size measurement setup, multi- wire beam size measurement setup, Aluminum foil puncture assembly etc. were developed and used. The paper presents the in-house development of various beam diagnostics for characterizing electron guns and their use. (author)

  7. The Continuous Electron Beam Accelerator Facility

    International Nuclear Information System (INIS)

    Grunder, H.A.; Bisognano, J.J.; Diamond, W.I.; Hartline, B.K.; Leemann, C.W.; Mougey, J.; Sundelin, R.M.; York, R.C.

    1987-01-01

    On February 13, 1987, construction started on the Continuous Electron Beam Accelerator Facility - a 4-GeV, 200-μA, continuous beam, electron accelerator facility designed for nuclear physics research. The machine has a racetrack configuration with two antiparallel, 500-MeV, superconducting linac segments connected by beam lines to allow four passes of recirculation. The accelerating structure consists of 1500-MHz, five-cell niobium cavities developed at Cornell University. A liquid helium cryogenic system cools the cavities to an operating temperature of 2 K. Beam extraction after any three of the four passes allows simultaneous delivery of up to three beams of independently variable currents and different, but correlated, energies to the three experimental areas. Beam breakup thresholds exceed the design current by nearly two orders of magnitude. Project completion and the start of physics operations are scheduled for 1993. The total estimated cost is $255 million

  8. Electron Beam Scanning in Industrial Applications

    Science.gov (United States)

    Jongen, Yves; Herer, Arnold

    1996-05-01

    Scanned electron beams are used within many industries for applications such as sterilization of medical disposables, crosslinking of wire and cables insulating jackets, polymerization and degradation of resins and biomaterials, modification of semiconductors, coloration of gemstones and glasses, removal of oxides from coal plant flue gasses, and the curing of advanced composites and other molded forms. X-rays generated from scanned electron beams make yet other applications, such as food irradiation, viable. Typical accelerators for these applications range in beam energy from 0.5MeV to 10 MeV, with beam powers between 5 to 500kW and scanning widths between 20 and 300 cm. Since precise control of dose delivery is required in many of these applications, the integration of beam characteristics, product conveyance, and beam scanning mechanisms must be well understood and optimized. Fundamental issues and some case examples are presented.

  9. Electron-impact ionization of SiCl{sub 3} using an improved crossed fast-neutral-beam - electron-beam apparatus

    Energy Technology Data Exchange (ETDEWEB)

    Mahoney, J M; Gutkin, M V; Tarnovsky, V; Becker, K [Department of Physics and Engineering Physics, Stevens Institute of Technology, Hoboken, NJ 07030 (United States)], E-mail: kbecker@poly.edu

    2008-05-15

    The fast-neutral-beam technique is a versatile approach to the determination of absolute cross sections for electron-impact ionization of atoms, stable molecules as well as free radicals and metastable species. A fast neutral beam of the species under study is prepared by charge-transfer neutralization of a mass-selected ion beam and the species are subsequently ionized by an electron beam. Mass- and energy-dispersive selection separates singly from multiply charged ions and parent from fragment ions and allows the determination of partial ionization cross sections. Here we describe some major improvements that were made recently to the fast-beam apparatus that has been used extensively for ionization cross section measurements for the past 15 years in our group. Experiments using well-established ionization cross sections in conjunction with extensive ion trajectory simulations were carried out to test the satisfactory performance of the modified fast-neutral-beam apparatus. We also report absolute partial cross sections for the formation of various singly charged positive ions produced by electron impact on SiCl{sub 3} for impact energies from threshold to 200 eV in the modified fast-beam apparatus.

  10. Electron gun design study for the IUCF beam cooling system

    International Nuclear Information System (INIS)

    Friesel, D.L.; Ellison, T.; Jones, W.P.

    1985-01-01

    The design of a low temperature electron beam cooling system for the Indiana University electron-cooled storage ring is in progress. The storage ring, which will accept the light ion beams from the existing k=200, multi-stage cyclotron facility, requires an electron beam variable in energy from about 7 to 275 keV. The electron beam system consists of a high perveance electron gun with Pierce geometry and a flat cathode. The gun and a 28 element accelerating column are immersed in a uniform longitudinal magnetic guide field. A computer modeling study of the system was conducted to determine electron beam density and transverse temperature variations as a function of anode region and accelerator column design parameters. Transverse electron beam temperatures (E /SUB t/ = mc 2 β 2 γ(/theta/ /SUB H/ +/theta/ /SUB v/ )) of less than a few tenths of an electron volt at a maximum current density of 0.4 A/cm 2 are desired over the full energy range. This was achieved in the calculations without the use of resonant focusing for a 2 Amp, 275 keV electron beam. Some systematics of the electron beam temperature variations with system design parameters are presented. A short discussion of the mechanical design of the proposed electron beam system is also given

  11. Protection of yttria-stabilized zirconia for dental applications by oxidic PVD coating.

    Science.gov (United States)

    Hübsch, C; Dellinger, P; Maier, H J; Stemme, F; Bruns, M; Stiesch, M; Borchers, L

    2015-01-01

    In this study, the application of transparent physical vapor deposition (PVD) coatings on zirconia ceramics was examined as an approach to retard the low-temperature degradation of zirconia for dental applications. Transparent monolayers of titanium oxide (TixOy) and multilayers consisting of titanium oxide-alumina-titanium oxide (TixOy-AlxOy-TixOy) were deposited onto standardized discs of 3Y-TZP using magnetron sputtering. Using X-ray photospectroscopy and time-of-flight secondary-ion mass spectrometry, the compositions of the coatings were verified, and an approximate thickness of 50 nm for each type of coating was ascertained. After aging the coated and uncoated samples in water vapor at 134°C and 3 bar for 4, 8, 16, 32, 64 and 128 h, the monoclinic phase content was determined using X-ray diffraction, and its impact on mechanical properties was assessed in biaxial flexural strength tests. In addition, the depth of the transformation zone was measured from scanning electron microscopy images of the fracture surfaces of hydrothermally aged samples. The results revealed that the tetragonal-to-monoclinic phase transformation of the zirconia ceramic was retarded by the application of PVD coatings. During the first stages of aging, the coated samples exhibited a significantly lower monoclinic phase content than the uncoated samples and, after 128 h of aging, showed a transformation zone which was only ∼12-15 μm thick compared to ∼30 μm in the control group. Biaxial flexural strength decreased by ∼10% during aging and was not influenced by the application of a PVD coating. Copyright © 2014 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  12. Observation of bifurcation phenomena in an electron beam plasma system

    International Nuclear Information System (INIS)

    Hayashi, N.; Tanaka, M.; Shinohara, S.; Kawai, Y.

    1995-01-01

    When an electron beam is injected into a plasma, unstable waves are excited spontaneously near the electron plasma frequency f pe by the electron beam plasma instability. The experiment on subharmonics in an electron beam plasma system was performed with a glow discharge tube. The bifurcation of unstable waves with the electron plasma frequency f pe and 1/2 f pe was observed using a double-plasma device. Furthermore, the period doubling route to chaos around the ion plasma frequency in an electron beam plasma system was reported. However, the physical mechanism of bifurcation phenomena in an electron beam plasma system has not been clarified so far. We have studied nonlinear behaviors of the electron beam plasma instability. It was found that there are some cases: the fundamental unstable waves and subharmonics of 2 period are excited by the electron beam plasma instability, the fundamental unstable waves and subharmonics of 3 period are excited. In this paper, we measured the energy distribution functions of electrons and the dispersion relation of test waves in order to examine the physical mechanism of bifurcation phenomena in an electron beam plasma system

  13. Transition radiation electron beam diagnostic study at ATF

    International Nuclear Information System (INIS)

    Qiu, X.Z.; Wang, X.J.; Batchelor, K.; Ben-Zvi, I.

    1995-01-01

    Recently we have started a program to develop transition radiation based electron beam diagnostics at the Accelerator Test Facility at Brookhaven National Laboratory. In this paper, we will discuss a technique to estimate the lower limit in electron beam divergence measurement with single foil transition radiation and two-foil transition radiation interferometer. Preliminary experimental data from 4.5 MeV electron beam will be presented

  14. Electron Beam Diagnosis and Dynamics using DIADYN Plasma Source

    Energy Technology Data Exchange (ETDEWEB)

    Toader, D; Craciun, G; Manaila, E; Oproiu, C [National Institute of Research for Laser, Plasma and Radiation Physics Bucuresti (Romania); Marghitu, S [ICPE Electrostatica S.A - Bucuresti (Romania)

    2009-11-15

    This paper is presenting results obtained with the DIADYN installation after replacing its vacuum electron source (VES{sub L}V) with a plasma electron source (PES{sub L}V). DIADYN is a low energy laboratory equipment operating with 10 to 50 keV electron beams and designed to help realize non-destructive diagnosis and dynamics for low energy electron beams but also to be used in future material irradiations. The results presented here regard the beam diagnosis and dynamics made with beams obtained from the newly replaced plasma source. We discuss both results obtained in experimental dynamics and dynamics calculation results for electron beams extracted from the SEP{sub L}V source.

  15. A beam position monitor system for electron cooler in HIRFL-CSR

    International Nuclear Information System (INIS)

    Li Guohong; Li Jie; Yang Xiaodong; Yan Tailai; Ma Xiaoming

    2010-01-01

    The efficient electron cooling requires that the ion beam and electron beam are parallel and overlapped. In order to measure the positions of ion beam and electron beam simultaneously, a beam position monitor system is developed for the HIRFL-CSR electron cooler device, which probe consists of four capacitive cylinder linear-cut poles. One can get the both beam positions from the picking up signals of four poles by using Fourier transform (FFT) method. The measurement results show that the beam position monitor system is accurate. This system is suitable for investigating the relation between electron cooling processing and the angle of ion beam and electron beam. (authors)

  16. Beam heating in solar flares - Electrons or protons?

    International Nuclear Information System (INIS)

    Brown, J.C.; Karlicky, M.; Mackinnon, A.L.; Van Den Oord, G.H.J.

    1990-01-01

    The current status of electron and proton beam models as candidates for the impulsive phase heating of solar flares is discussed in relation to observational constants and theoretical difficulties. It is concluded that, while the electron beam model for flare heating still faces theoretical and observational problems, the problems faced by low and high energy proton beam models are no less serious, and there are facets of proton models which have not yet been studied. At the present, the electron beam model remains the most viable and best developed of heating model candidates. 58 refs

  17. Three-dimensional electron-beam dose calculations

    International Nuclear Information System (INIS)

    Shiu, A.S.

    1988-01-01

    The MDAH pencil-beam algorithm developed by Hogstrom et al (1981) has been widely used in clinics for electron-beam dose calculations for radiotherapy treatment planning. The primary objective of this research was to address several deficiencies of that algorithm and to develop an enhanced version. Two enhancements were incorporated into the pencil-beam algorithm; one models fluence rather than planar fluence, and the other models the bremsstrahlung dose using measured beam data. Comparisons of the resulting calculated dose distributions with measured dose distributions for several test phantoms have been made. From these results it is concluded (1) that the fluence-based algorithm is more accurate to use for the dose calculation in an inhomogeneous slab phantom, and (2) the fluence-based calculation provides only a limited improvement to the accuracy the calculated dose in the region just downstream of the lateral edge of an inhomogeneity. A pencil-beam redefinition model was developed for the calculation of electron-beam dose distributions in three dimensions

  18. Preliminary investigations on high energy electron beam tomography

    Energy Technology Data Exchange (ETDEWEB)

    Baertling, Yves; Hoppe, Dietrich; Hampel, Uwe

    2010-12-15

    In computed tomography (CT) cross-sectional images of the attenuation distribution within a slice are created by scanning radiographic projections of an object with a rotating X-ray source detector compound and subsequent reconstruction of the images from these projection data on a computer. CT can be made very fast by employing a scanned electron beam instead of a mechanically moving X-ray source. Now this principle was extended towards high-energy electron beam tomography with an electrostatic accelerator. Therefore a dedicated experimental campaign was planned and carried out at the Budker Institute of Nuclear Physics (BINP), Novosibirsk. There we investigated the capabilities of BINP's accelerators as an electron beam generating and scanning unit of a potential high-energy electron beam tomography device. The setup based on a 1 MeV ELV-6 (BINP) electron accelerator and a single detector. Besides tomographic measurements with different phantoms, further experiments were carried out concerning the focal spot size and repeat accuracy of the electron beam as well as the detector's response time and signal to noise ratio. (orig.)

  19. Apparatus for electron beam irradiation of objects

    International Nuclear Information System (INIS)

    Dmitriev, S.P.; Ivanov, A.S.; Sviniin, M.P.; Fedotov, M.T.

    1984-01-01

    This patent provides an apparatus for electron beam irradiation of objects, comprising a shaper of a ribbon-shaped electron beam and a deflecting electromagnet having a frame-type magnetic circuit and used to direct said electron beam onto an irradiated object substantially at an angle of 90 degrees. The deflecting electromagnet has two poles extended over the width of the irradiated object and comprises two windings embracing said poles and connected to a d.c. source. The deflecting electromagnet is arranged in such a manner that the trajectories of the electrons at an area from the shaper to the electromagnet are inclined to the plane of the frame of its magnetic circuit

  20. Surface sterilization by low energy electron beams

    International Nuclear Information System (INIS)

    Sekiguchi, Masayuki; Tabei, Masae

    1989-01-01

    The germicidal effectiveness of low energy electron beams (175 KV) against bacterial cells was investigated. The dry spores of Bacillus pumilus ATCC 27142 and Bacillus globigii ATCC 9372 inoculated on carrier materials and irradiated by gamma rays showed the exponential type of survival curves whereas they showed sigmoidal ones when exposed to low energy electron beams. When similarly irradiated, the wet spores inoculated on membrane filter showed the same survival curves as the dry spores inoculated on carrier materials. The wet vegetative cells of Escherichia coli ATCC 25922 showed exponential curves when exposed to gamma and electron beam irradiation. Low energy electron beams in air showed little differences from nitrogen stream in their germicidal effectiveness against dry spores of B. pumilus. The D values of B. pumilus spores inoculated on metal plates decreased as the amounts of backscattering electrons from the plates increased. There was adequate correlation between the D value (linear region of survival curve), average D value (6D/6) and 1% survival dose and backscattering factor. Depth dose profile and backscatterig dose of low energy electron beams were measured by radiochromic dye film dosimeter (RCD). These figures were not always in accord with the observed germicidal effectiveness against B. pumilus spores because of varying thickness of RCD and spores inoculated on carrier material. The dry spores were very thin and this thinness was useful in evaluating the behavior of low energy electrons. (author)

  1. Intense relativistic electron beam: generation and propagation

    International Nuclear Information System (INIS)

    Mittal, K.C.; Mondal, J.

    2010-01-01

    A general review of relativistic electron beam extracted from explosive field emission diode has been presented here. The beam current in the diode gap taking into account cathode and anode plasma expansion velocity and excluding the self magnetic field effect is directly proportional to gap voltage V 3/2 and inversely proportional to the square of the effective diode gap (d-vt). In the limit of high current, self magnetic field focusing effect comes into play and results in a critical current at which pinching will take place. When the diode current exceeds the critical current, the electron flow is in the para-potential regime. Different diode geometries such as planner, coaxial, rod-pinched, reflex triode are discussed qualitatively. When the beam is injected into a vacuum drift tube the propagation of the beam is only possible in presence of a strong axial magnetic field which prevents the beam expansion in the radial direction. If the beam is injected in the drift tube filled with dense plasma, then the redistribution of the plasma electrons effectively neutralizes the beam space charge, resulting subsequent propagation of the beam along the drift tube. The beam propagation through neutral gas is similar to the plasma filled drift tube. In this case both the neutral gas pressure and the beam current regulate the transmission of the REB. (author)

  2. The large density electron beam-plasma Buneman instability

    International Nuclear Information System (INIS)

    Mantei, T.D.; Doveil, F.; Gresillon, D.

    1976-01-01

    The threshold conditions and growth rate of the Buneman (electron beam-stationary ion) instability are calculated with kinetic theory, including a stationary electronic population. A criteria on the wave energy sign is used to separate the Buneman hydrodynamic instability from the ion-acoustic kinetic instability. The stationary electron population raises the instability threshold and, for large beam velocities yields a maximum growth rate oblique to the beam. (author)

  3. A research of possibility for negative muon production by a low energy electron beam accompanying ion beam

    International Nuclear Information System (INIS)

    Uramoto, Joshin.

    1993-12-01

    A low energy electron beam (≤ 2000 eV) is injected perpendicularly to a uniform magnetic field, together with a low energy positive ion beam. On this magnetic mass analysis (using the uniform magnetic field), a peak of secondary electron current to the beam collector (arranging as a mass analyzer of 90deg type), appears at an analyzing magnetic field which corresponds exactly to a relation of negative muon μ - (the mass m=207 m e and the charge q=e, where m e and e are mass and charge of electron). The ion beam is essential for the peak appearance, which is produced by decelerating electrically the electron beam in front of the entrance slit of the mass analyzer, and by introducing a neutral gas into the electron beam region and producing a plasma through the ionization. We consider that a very small amount of negative muons may be produced through local cyclotron motions of the injected beam electrons in the ion beam or by an interaction between the bunched beam electrons and beam ions. (author)

  4. Transparent conducting ZnO-CdO thin films deposited by e-beam evaporation technique

    Science.gov (United States)

    Mohamed, H. A.; Ali, H. M.; Mohamed, S. H.; Abd El-Raheem, M. M.

    2006-04-01

    Thin films of Zn{1-x} Cd{x}O with x = 0, 0.1, 0.2, 0.3, 0.4 and 0.5 at.% were deposited by electron-beam evaporation technique. It has been found that, for as-deposited films, both the transmittance and electrical resistivity decreased with increasing the Cd content. To improve the optical and electrical properties of these films, the effect of annealing temperature and time were taken into consideration for Zn{1-x} Cd{x}O film with x = 0.2. It was found that, the optical transmittance and the electrical conductivity were improved significantly with increasing the time of annealing. At fixed temperature of 300 °C, the transmittance increased with increasing the time of annealing and reached its maximum values of 81% in the visible region and 94% in the NIR region at annealing time of 120 min. The low electrical resistivity of 3.6 × 10-3 Ω cm was achieved at the same conditions. Other parameters named free carrier concentrations, refractive index, extinction coefficient, plasma frequency, and relaxation time were studied as a function of annealing temperature and time for 20% Cd content.

  5. Measurement of electron beam polarization at the SLC

    International Nuclear Information System (INIS)

    Steiner, H.

    1987-03-01

    The polarimeters needed to monitor and measure electron beam polarization at the Stanford Linear Collider are discussed. Two types of polarimeters, are to be used. The first is based on the spin dependent elastic scattering of photons from high energy electrons. The second utilizes the spin dependence of elastic electron-electron scattering. The plans of the SLC polarization group to measure and monitor electron beam polarization are discussed. A brief discussion of the physics and the demands it imposes on beam polarization measurements is presented. The Compton polarimeter and the essential characteristics of two Moeller polarimeters are presented

  6. Simple model of electron beam initiated dielectric breakdown

    International Nuclear Information System (INIS)

    Beers, B.L.; Daniell, R.E.; Delmer, T.N.

    1985-01-01

    A steady state model that describes the internal charge distribution of a planar dielectric sample exposed to a uniform electron beam was developed. The model includes the effects of charge deposition and ionization of the beam, separate trap-modulated mobilities for electrons and holes, electron-hole recombination, and pair production by drifting thermal electrons. If the incident beam current is greater than a certain critical value (which depends on sample thickness as well as other sample properties), the steady state solution is non-physical

  7. Formation of a high quality electron beam using photo cathode RF electron gun

    International Nuclear Information System (INIS)

    Washio, Masakazu

    2000-01-01

    Formation of a high quality electron beam using photo cathode RF electron gun is expected for formation of a next generation high brilliant X-ray beam and a source for electron and positron collider. And, on a field of material science, as is possible to carry out an experiment under ultra short pulse and extremely high precision in time, it collects large expectation. Recently, formation of high quality beam possible to develop for multi directions and to use by everyone in future has been able to realize. Here were explained on electron beam source, principle and component on RF electron gun, working features on RF gun, features and simulation of RF gun under operation, and some views in near future. (G.K.)

  8. Optimization of Beam Transmission of PAL-PNF Electron Linac

    Energy Technology Data Exchange (ETDEWEB)

    Shin, S. G.; Kim, S. K.; Kim, E. A. [Pohang University of Science and Technology, Pohang (Korea, Republic of)

    2012-05-15

    The PNF (Pohang Neutron Facility) electron Linac is providing converted neutrons and photons from electron beams to users for nuclear physics experiments and high energy gamma-ray exposures. This linac is capable of producing 100 MeV electron beams with a beam current of pulsed 100 mA. The pulse length is 2 {mu}s and the pulse repetition rate is typically 30 Hz. This linac consists of two SLAC-type S-band accelerating columns and the thermionic RF gun. They are powered by one klystron and the matching pulse modulator. The electron beams emitted from the RF gun are bunched as they pass through the alpha magnet and are injected into the accelerating column thereafter. In this paper, we discuss procedures and results of the beam transmission optimization with technical details of the accelerator system. We also briefly discuss the future upgrade plan to obtain short-pulse or electron beams for neutron TOF experiments by adopting a triode type thermionic DC electron gun

  9. Adaptive PVD Steganography Using Horizontal, Vertical, and Diagonal Edges in Six-Pixel Blocks

    Directory of Open Access Journals (Sweden)

    Anita Pradhan

    2017-01-01

    Full Text Available The traditional pixel value differencing (PVD steganographical schemes are easily detected by pixel difference histogram (PDH analysis. This problem could be addressed by adding two tricks: (i utilizing horizontal, vertical, and diagonal edges and (ii using adaptive quantization ranges. This paper presents an adaptive PVD technique using 6-pixel blocks. There are two variants. The proposed adaptive PVD for 2×3-pixel blocks is known as variant 1, and the proposed adaptive PVD for 3×2-pixel blocks is known as variant 2. For every block in variant 1, the four corner pixels are used to hide data bits using the middle column pixels for detecting the horizontal and diagonal edges. Similarly, for every block in variant 2, the four corner pixels are used to hide data bits using the middle row pixels for detecting the vertical and diagonal edges. The quantization ranges are adaptive and are calculated using the correlation of the two middle column/row pixels with the four corner pixels. The technique performs better as compared to the existing adaptive PVD techniques by possessing higher hiding capacity and lesser distortion. Furthermore, it has been proven that the PDH steganalysis and RS steganalysis cannot detect this proposed technique.

  10. An Electron-Beam Profile Monitor Using Fresnel Zone Plates

    International Nuclear Information System (INIS)

    Nakamura, Norio; Sakai, Hiroshi; Iida, Kensuke; Shinoe, Kenji; Takaki, Hiroyuki; Fujisawa, Masami; Hayano, Hitoshi; Muto, Toshiya; Nomura, Masaharu; Kamiya, Yukihide; Koseki, Tadashi; Amemiya, Yoshiyuki; Aoki, Nobutada; Nakayama, Koichi

    2004-01-01

    We have developed a beam profile monitor using two Fresnel zone plates (FZPs) at the KEK-ATF (Accelerator Test Facility) damping ring to measure small electron-beam sizes for low-emittance synchrotron radiation sources. The monitor has a structure of an X-ray microscope, where two FZPs constitute an X-ray imaging optics. In the monitor system, the synchrotron radiation from the electron beam at the bending magnet is monochromatized to 3.235-keV X-rays by a crystal monochromator and the transverse electron-beam image is twenty-times magnified by the two FZPs and detected on an X-ray CCD camera. This monitor has the following advantages: (1) high spatial resolution, (2) non-destructive measurement, (3) real-time monitoring, and (4) direct electron-beam imaging. With the beam profile monitor, we have succeeded in obtaining a clear electron-beam image and measuring the extremely small beam size less than 10 μm. The measured magnification of the imaging optics was in good agreement with the design value

  11. Electron beam writing on semiconductors

    International Nuclear Information System (INIS)

    Bierhenke, H.; Kutzer, E.; Pascher, A.; Plitzner, H.; Rummel, P.; Siemens A.G., Muenchen; Siemens A.G., Muenchen

    1979-08-01

    Reported are the results of the 3 1/2 year research project 'Electron beam Writing on Semiconductors'. Work has been done in the field of direct wafer exposure techniques, and of mask making. Described are resist technology, setting up of a research device, exploration of alignment procedures, manufacturing of devices and their radiation influence. Furthermore, investigations and measurements of an electron beam machine bought for mask making purposes, the development of LSI-circuits with this machine, the software necessary and important developments of digital subsystems are reported. (orig.) [de

  12. Shimmed electron beam welding process

    Science.gov (United States)

    Feng, Ganjiang; Nowak, Daniel Anthony; Murphy, John Thomas

    2002-01-01

    A modified electron beam welding process effects welding of joints between superalloy materials by inserting a weldable shim in the joint and heating the superalloy materials with an electron beam. The process insures a full penetration of joints with a consistent percentage of filler material and thereby improves fatigue life of the joint by three to four times as compared with the prior art. The process also allows variable shim thickness and joint fit-up gaps to provide increased flexibility for manufacturing when joining complex airfoil structures and the like.

  13. 3D shaping of electron beams using amplitude masks

    Energy Technology Data Exchange (ETDEWEB)

    Shiloh, Roy, E-mail: royshilo@post.tau.ac.il; Arie, Ady

    2017-06-15

    Highlights: • Electron beams are shaped in 3D with examples of curves and lattices. • Computer generated holograms are manifested as binary amplitude masks. • Applications in electron-optical particle trapping, manipulation, and synthesis. • Electron beam lithography fabrication scheme explained in detail. • Measurement paradigms of 3D shaped beams are discussed. - Abstract: Shaping the electron wavefunction in three dimensions may prove to be an indispensable tool for research involving atomic-sized particle trapping, manipulation, and synthesis. We utilize computer-generated holograms to sculpt electron wavefunctions in a standard transmission electron microscope in 3D, and demonstrate the formation of electron beams exhibiting high intensity along specific trajectories as well as shaping the beam into a 3D lattice of hot-spots. The concepts presented here are similar to those used in light optics for trapping and tweezing of particles, but at atomic scale resolutions.

  14. Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope

    International Nuclear Information System (INIS)

    Liu, Z.Q.; Mitsuishi, K.; Furuya, K.

    2005-01-01

    Attempts were made to fabricate three-dimensional nanostructures on and out of a substrate by electron-beam-induced deposition in a 200-kV scanning transmission electron microscope. Structures with parallel wires over the substrate surface were difficult to fabricate due to the direct deposition of wires on both top and bottom surfaces of the substrate. Within the penetration depth of the incident electron beam, nanotweezers were fabricated by moving the electron beam beyond different substrate layers. Combining the deposition of self-supporting wires and self-standing tips, complicated three-dimensional doll-like, flag-like, and gate-like nanostructures that extend out of the substrate were successfully fabricated with one-step or multi-step scans of the electron beam. Effects of coarsening, nucleation, and distortion during electron-beam-induced deposition are discussed. (orig.)

  15. Electron beam energy monitoring using thermoluminescent dosimeters and electron back scattering

    International Nuclear Information System (INIS)

    Nelson, Vinod; Gray, Alison

    2013-01-01

    Periodic checks of megavoltage electron beam quality are a fundamental requirement in ensuring accurate radiotherapy treatment delivery. In the present work, thermoluminescent dosimeters (TLDs) positioned on either side of a lead sheet at the surface of a water equivalent phantom were used to monitor electron beam quality using the electron backscattering method. TLD100 and TLD100H were evaluated as upstream detectors and TLD200, TLD400 and TLD500 were evaluated as downstream detectors. The evaluation assessed the test sensitivity and correlation, long and short term reproducibility, dose dependence and glow curve features. A prototype of an in-air jig suitable for use in postal TLD dose audits was also developed and an initial evaluation performed. The results indicate that the TLD100-TLD200 combination provides a sensitive and reproducible method to monitor electron beam quality. The light weight and easily fabricated in-air jig was found to produce acceptable results and has the potential to be used by radiation monitoring agencies to carry out TLD postal quality assurance audits, similar to audits presently being conducted for photon beams. -- Highlights: ► Monitoring electron beam quality via electron backscattering was investigated. ► Different thermoluminescent materials were evaluated as detectors. ► A TLD100-TLD200 combination produced the most sensitive and reproducible results. ► An in-air jig was evaluated to allow measurements via postal dose audits

  16. AECL IMPELA electron beam industrial irradiators

    International Nuclear Information System (INIS)

    Labrie, J.P.; Drewell, N.H.; Ebrahim, N.A.; Lawrence, C.B.; Mason, V.A.; Ungrin, J.; White, B.F.

    1989-01-01

    A family of industrial irradiators is being developed by AECL to cover an electron-beam energy range from 5 to 18 MeV at beam powers between 20 and 250 kW. The IMPELA family of irradiators is designed for push button, reliable operation. The major irradiator components are modular, allowing for later upgrades to meet increased demands in either electron or X-ray mode. Interface between the control system, irradiator availability and dose quality assurance is in conformance with the most demanding specifications. The IMPELA irradiators use a klystron-driven, standing-wave, L-band accelerator structure with direct injection from a rugged, triode electron gun. Direct control of the accelerating field during the beam pulse ensures constant output beam energy, independent of beam power. The first member of the family, the IMPELA 10/50 (10 MeV, 50 kW), is in the final stages of assembly at Chalk River Nuclear Laboratories. The IMPELA 10/50 is constructed around a 3.25 m long, high-power-capacity accelerator structure operated at a duty factor of 5%. Beam loading exceeds 60%. The rf power is provided by a 2 MW/150 kW modulated-anode klystron protected from load mismatches by a circulator. This prototype will be used to demonstrate the reliability and dose uniformity targets of the IMPELA family. Full beam operation of the IMPELA 10/50 is scheduled for early 1989. (orig.)

  17. Current state and prospects of industrial application of electron beam irradiation

    International Nuclear Information System (INIS)

    Washio, Masakazu

    2000-01-01

    This paper reviewed the low energy, medium energy, and high energy accelerators used for the industrial application of electron beams. Next, it described the absorption of electron beam energy, distribution of the absorbed dose of electron beams in a substance, and the basis of electron beam reaction. Furthermore, as the industrial application examples of electron beams, it briefly described about the reforming and curing of polymers, irradiation effect of inorganic material (characteristic control of semiconductors), and sterilization. Regarding curing, as examples using mainly low energy electron beams (300 keV or below), this paper briefly explained the manufacture of thermosensitive recording materials, electron beam cured silicone for release papers, tunnel metal interior finishing board, high gloss - high smooth paper. Finally, it looked at latest trends and prospects of electron beam generators. (A.O.)

  18. Manufacturing prepainted steel sheet by electron beam curing

    International Nuclear Information System (INIS)

    Oka, Joji

    1987-01-01

    Several advantages are offered by electron beam curing. A formidably hard and stain resistant paint film which is difficult to obtain by heat curing paint is developed. As a result, a unique new prepainted steel is produced. Four technologies are involved: development high-quality paint, selection of optimum electron beam processor, technology to control electron beam processing atmosphere and secondary X-ray shield technology. These technologies are described in detail. (A.J.)

  19. Coherent electromagnetic radiation of a combined electron-ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Pankratov, S G; Samoshenkov, Yu K [Vsesoyuznyj Nauchno-Issledovatel' skij Inst. Optiko-Fizicheskikh Izmerenij, Moscow (USSR)

    1977-07-01

    The intensity of coherent electromagnetic radiation due to interaction of a modulated electron beam with a modulated ion beam is calculated. It is shown that the radiation intensity has a sharp maximum at the frequency equal to the difference of the modulation frequency of the electron and ion beams. The results obtained are compared with those corresponding to the scattering of a modulated electron beam on randomly distributed gas ions.

  20. Measurement of the electron beam mode in earth's foreshock

    Science.gov (United States)

    Onsager, T. G.; Holzworth, R. H.

    1990-01-01

    High frequency electric field measurements from the AMPTE IRM plasma wave receiver are used to identify three simultaneously excited electrostatic wave modes in the earth's foreshock region: the electron beam mode, the Langmuir mode, and the ion acoustic mode. A technique is developed which allows the rest frame frequecy and wave number of the electron beam waves to be determined. It is shown that the experimentally determined rest frame frequency and wave number agree well with the most unstable frequency and wave number predicted by linear homogeneous Vlasov theory for a plasma with Maxwellian background electrons and a Lorentzian electron beam. From a comparison of the experimentally determined and theoretical values, approximate limits are put on the electron foreshock beam temperatures. A possible generation mechanism for ion acoustic waves involving mode coupling between the electron beam and Langmuir modes is also discussed.

  1. Material machining with pseudo-spark electron beams

    International Nuclear Information System (INIS)

    Benker, W.; Christiansen, J.; Frank, K.; Gundel, H.; Redel, T.; Stetter, M.

    1989-01-01

    The authors give a brief description of the production of pseudo-spark (low pressure gas discharge) electron beams. They illustrate the use of these electron beams for machining not only conducting, semiconducting and insulating materials, but also thin layers of such materials as high temperature superconducting ceramics

  2. Radiative cooling of relativistic electron beams

    International Nuclear Information System (INIS)

    Huang, Z.

    1998-05-01

    Modern high-energy particle accelerators and synchrotron light sources demand smaller and smaller beam emittances in order to achieve higher luminosity or better brightness. For light particles such as electrons and positrons, radiation damping is a natural and effective way to obtain low emittance beams. However, the quantum aspect of radiation introduces random noise into the damped beams, yielding equilibrium emittances which depend upon the design of a specific machine. In this dissertation, the author attempts to make a complete analysis of the process of radiation damping and quantum excitation in various accelerator systems, such as bending magnets, focusing channels and laser fields. Because radiation is formed over a finite time and emitted in quanta of discrete energies, he invokes the quantum mechanical approach whenever the quasiclassical picture of radiation is insufficient. He shows that radiation damping in a focusing system is fundamentally different from that in a bending system. Quantum excitation to the transverse dimensions is absent in a straight, continuous focusing channel, and is exponentially suppressed in a focusing-dominated ring. Thus, the transverse normalized emittances in such systems can in principle be damped to the Compton wavelength of the electron, limited only by the Heisenberg uncertainty principle. In addition, he investigates methods of rapid damping such as radiative laser cooling. He proposes a laser-electron storage ring (LESR) where the electron beam in a compact storage ring repetitively interacts with an intense laser pulse stored in an optical resonator. The laser-electron interaction gives rise to rapid cooling of electron beams and can be used to overcome the space charge effects encountered in a medium energy circular machine. Applications to the designs of low emittance damping rings and compact x-ray sources are also explored

  3. Radiative cooling of relativistic electron beams

    Energy Technology Data Exchange (ETDEWEB)

    Huang, Zhirong [Stanford Univ., CA (United States)

    1998-05-01

    Modern high-energy particle accelerators and synchrotron light sources demand smaller and smaller beam emittances in order to achieve higher luminosity or better brightness. For light particles such as electrons and positrons, radiation damping is a natural and effective way to obtain low emittance beams. However, the quantum aspect of radiation introduces random noise into the damped beams, yielding equilibrium emittances which depend upon the design of a specific machine. In this dissertation, the author attempts to make a complete analysis of the process of radiation damping and quantum excitation in various accelerator systems, such as bending magnets, focusing channels and laser fields. Because radiation is formed over a finite time and emitted in quanta of discrete energies, he invokes the quantum mechanical approach whenever the quasiclassical picture of radiation is insufficient. He shows that radiation damping in a focusing system is fundamentally different from that in a bending system. Quantum excitation to the transverse dimensions is absent in a straight, continuous focusing channel, and is exponentially suppressed in a focusing-dominated ring. Thus, the transverse normalized emittances in such systems can in principle be damped to the Compton wavelength of the electron, limited only by the Heisenberg uncertainty principle. In addition, he investigates methods of rapid damping such as radiative laser cooling. He proposes a laser-electron storage ring (LESR) where the electron beam in a compact storage ring repetitively interacts with an intense laser pulse stored in an optical resonator. The laser-electron interaction gives rise to rapid cooling of electron beams and can be used to overcome the space charge effects encountered in a medium energy circular machine. Applications to the designs of low emittance damping rings and compact x-ray sources are also explored.

  4. Electron-Beam Deposition of Superconducting Molybdenum Thin Films for the Development of Mo/Au TES X-Ray Microcalorimeter

    Science.gov (United States)

    Finkbeiner, Fred Michael; Adams, Joseph S.; Bandler, Simon R.; Betancour-Martinez, Gabriele L.; Brown, Ari David; Chang, Meng-Ping; Chervenak, James A.; Chiao, Meng P.; Datesman, Aaron; Eckart, Megan E.; hide

    2016-01-01

    We are exploring the properties of electron-beam evaporated molybdenum thin films on silicon nitride coated silicon wafers at substrate temperatures between room temperature and 650 C. The temperature dependence of film stress, transition temperature, and electrical properties are presented. X-ray diffraction measurements are performed to gain information on molybdenum crystallite size and growth. Results show the dominant influence of the crystallite size on the intrinsic properties of our films. Wafer-scale uniformity, wafer yield, and optimal thermal bias regime for TES fabrication are discussed.

  5. Scrap uranium recycling via electron beam melting

    International Nuclear Information System (INIS)

    McKoon, R.

    1993-11-01

    A program is underway at the Lawrence Livermore National Laboratory (LLNL) to recycle scrap uranium metal. Currently, much of the material from forging and machining processes is considered radioactive waste and is disposed of by oxidation and encapsulation at significant cost. In the recycling process, uranium and uranium alloys in various forms will be processed by electron beam melting and continuously cast into ingots meeting applicable specifications for virgin material. Existing vacuum processing facilities at LLNL are in compliance with all current federal and state environmental, safety and health regulations for the electron beam melting and vaporization of uranium metal. One of these facilities has been retrofitted with an auxiliary electron beam gun system, water-cooled hearth, crucible and ingot puller to create an electron beam melt furnace. In this furnace, basic process R ampersand D on uranium recycling will be performed with the goal of eventual transfer of this technology to a production facility

  6. Electron distribution function in electron-beam-excited plasmas

    International Nuclear Information System (INIS)

    Brau, C.A.

    1976-01-01

    In monatomic plasmas excited by high-intensity relativistic electron beams, the electron secondary distribution function is dominated by elastic electron-electron collisions at low electron energies and by inelastic electron-atom collisions at high electron energies (above the excitation threshold). Under these conditions, the total rate of excitation by inelastic collisions is limited by the rate at which electron-electron collisions relax the distribution function in the neighborhood of the excitation threshold. To describe this effect quantitatively, an approximate analytic solution of the electron Boltzmann equation is obtained, including both electron-electron and inelastic collisions. The result provides a simple formula for the total rate of excitation

  7. Electron beam interaction with space plasmas.

    Science.gov (United States)

    Krafft, C.; Bolokitin, A. S.

    1999-12-01

    Active space experiments involving the controlled injection of electron beams and the formation of artificially generated currents can provide in many cases a calibration of natural phenomena connected with the dynamic interaction of charged particles with fields. They have a long history beginning from the launches of small rockets with electron guns in order to map magnetic fields lines in the Earth's magnetosphere or to excite artificial auroras. Moreover, natural beams of charged particles exist in many space and astrophysical plasmas and were identified in situ by several satellites; a few examples are beams connected with solar bursts, planetary foreshocks or suprathermal fluxes traveling in planetary magnetospheres. Many experimental and theoretical works have been performed in order to interpret or plan space experiments involving beam injection as well as to understand the physics of wave-particle interaction, as wave radiation, beam dynamics and background plasma modification.

  8. Generation of an intense ion beam by a pinched relativistic electron beam

    International Nuclear Information System (INIS)

    Gilad, P.; Zinamon, Z.

    1976-01-01

    The pinched electron beam of a pulsed electron accelerator is used to generate an intense beam of ions. A foil anode and vacuum drift tube are used. The space charge field of the pinched beam in the tube accelerates ions from the foil anode. Ion currents of 10 kA at a density of 5kA/cm 2 with pulse length of 50 ns are obtained using a 5 kJ, 450 kV, 3 Ω diode. (author)

  9. Laser-Compton Scattering as a Potential Electron Beam Monitor

    International Nuclear Information System (INIS)

    Chouffani, K.; Wells, D.; Harmon, F.; Lancaster, G.; Jones, J.

    2002-01-01

    LCS experiments were carried out at the Idaho Accelerator Center (IAC); sharp monochromatic x-ray lines were observed. These are produced using the so-called inverse Compton effect, whereby optical laser photons are collided with a relativistic electron beam. The back-scattered photons are then kinematically boosted to keV x-ray energies. We have first demonstrated these beams using a 20 MeV electron beam collided with a 100 MW, 7 ns Nd; YAG laser. We observed narrow LCS x-ray spectral peaks resulting from the interaction of the electron beam with the Nd; YAG laser second harmonic (532 nm). The LCS x-ray energy lines and energy deviations were measured as a function of the electron beam energy and energy-spread respectively. The results showed good agreement with the predicted valves. LCS could provide an excellent probe of electron beam energy, energy spread, transverse and longitudinal distribution and direction

  10. Electron beam directed energy device and methods of using same

    Science.gov (United States)

    Retsky, Michael W.

    2007-10-16

    A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

  11. Characterisation of 100 kW electron beam melting gun and its adaptation as electron gun for high power DC electron accelerators

    International Nuclear Information System (INIS)

    Banerjee, Srutarshi; Bhattacharjee, Dhruva; Waghmare, Abhay; Tiwari, Rajnish; Bakhtsingh, R.I.; Dasgupta, K.; Gupta, Sachin; Prakash, Baibhaw; Jha, M.N.

    2015-01-01

    The paper deals with the characterization of the 100 kW electron beam melting gun for its adaptation in high power DC Electron Accelerators. The indigenously designed electron beam melting system at BARC is chosen for characterization. It comprises of electron gun as source of electrons, two electromagnetic focusing lenses viz. upper focusing lens and lower focusing lens for beam focusing, intermediate beam aperture for vacuum decoupling between gun region and melt zone, deflection and oscillation lens for maneuvering the beam on the melt charge and water cooled crucible that acts as a beam dump. In this system, the electron gun is designed for 40 kV and 100 kW corresponding to a maximum beam current of 2.5 A. The electron gun uses directly heated spiral tungsten filament. The operating temperature of the filament is 2800 °K. The focusing electrode and the anode profile are designed based on Pierce geometry. High Power DC Electron Accelerators require high currents of 1 A. The beam must comply with the requirement of 40 mm beam diameter and 10 mrad divergence at the exit of the electron gun. The characterization of the existing electron gun was done to find out all the beam parameters, for e.g. beam size, beam divergence, perveance etc. to be adapted or to be modified for the design of electron gun for high power DC accelerators. This paper shows limitations and the possible solutions for design of high power DC accelerators. (author)

  12. Radiation-free superhydrophilic and antifogging properties of e-beam evaporated TiO2 films on glass

    Science.gov (United States)

    Garlisi, Corrado; Palmisano, Giovanni

    2017-10-01

    In this work, we show the unique wettability properties of TiO2 thin films deposited by e-beam evaporation on glass and treated at 500 °C. The deposited materials exhibited compact non-porous structures and their non-UV activated superwetting behavior was characterized, emphasizing the better performance compared to the bare glass substrate and to a commercial self-cleaning glass (Pilkington Activ™) even in terms of antifogging and optical properties. The results demonstrate how the superhydrophilic character arises from the used deposition technique inducing a large amount of oxygen vacancies further boosted by the annealing treatment, allowing for the fabrication of a pioneering material in the area of multifunctional coatings. The superhydrophilic character was maintained even at an extremely small thickness (20 nm), similarly to the adhesion of the film to the glass substrate, as confirmed by ultrasound stress tests and the cross-cut test performed according to ISO 2409 standard. The photocatalytic activity of the e-beam evaporated film was also assessed by degradation of methanol, 2-propanol and toluene under UV light in a gas phase reactor and the performance was found to be in most cases superior compared to Pilkington Activ™.

  13. Generation and application of bessel beams in electron microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Grillo, Vincenzo, E-mail: vincenzo.grillo@cnr.it [CNR-Istituto Nanoscienze, Centro S3, Via G Campi 213/a, I-41125 Modena (Italy); CNR-IMEM, Parco Area delle Scienze 37/A, I-43124 Parma (Italy); Harris, Jérémie [Department of Physics, University of Ottawa, 25 Templeton St., Ottawa, Ontario, Canada K1N 6N5 (Canada); Gazzadi, Gian Carlo [CNR-Istituto Nanoscienze, Centro S3, Via G Campi 213/a, I-41125 Modena (Italy); Balboni, Roberto [CNR-IMM Bologna, Via P. Gobetti 101, 40129 Bologna (Italy); Mafakheri, Erfan [Dipartimento di Fisica Informatica e Matematica, Università di Modena e Reggio Emilia, via G Campi 213/a, I-41125 Modena (Italy); Dennis, Mark R. [H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL (United Kingdom); Frabboni, Stefano [CNR-Istituto Nanoscienze, Centro S3, Via G Campi 213/a, I-41125 Modena (Italy); Dipartimento di Fisica Informatica e Matematica, Università di Modena e Reggio Emilia, via G Campi 213/a, I-41125 Modena (Italy); Boyd, Robert W.; Karimi, Ebrahim [Department of Physics, University of Ottawa, 25 Templeton St., Ottawa, Ontario, Canada K1N 6N5 (Canada)

    2016-07-15

    We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual electron-optical configuration used experimentally. We show that by optimizing our nanofabrication recipe, electron Bessel beams can be generated with relative efficiencies reaching 37±3%. We also demonstrate by tuning various hologram parameters that electron Bessel beams can be produced with many visible rings, making them ideal for interferometric applications, or in more highly localized forms with fewer rings, more suitable for imaging. We describe the settings required to tune beam localization in this way, and explore beam and hologram configurations that allow the convergences and topological charges of electron Bessel beams to be controlled. We also characterize the phase structure of the Bessel beams generated with our technique, using a simulation procedure that accounts for imperfections in the hologram manufacturing process. - Highlights: • Bessel beams with different convergence, topological charge, visible fringes are demonstrated. • The relation between the Fresnel hologram and the probe shape is explained by detailed calculations and experiments. • Among the holograms here presented the highest relative efficiency is 37%, the best result ever reached for blazed holograms.

  14. Generation and application of bessel beams in electron microscopy

    International Nuclear Information System (INIS)

    Grillo, Vincenzo; Harris, Jérémie; Gazzadi, Gian Carlo; Balboni, Roberto; Mafakheri, Erfan; Dennis, Mark R.; Frabboni, Stefano; Boyd, Robert W.; Karimi, Ebrahim

    2016-01-01

    We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual electron-optical configuration used experimentally. We show that by optimizing our nanofabrication recipe, electron Bessel beams can be generated with relative efficiencies reaching 37±3%. We also demonstrate by tuning various hologram parameters that electron Bessel beams can be produced with many visible rings, making them ideal for interferometric applications, or in more highly localized forms with fewer rings, more suitable for imaging. We describe the settings required to tune beam localization in this way, and explore beam and hologram configurations that allow the convergences and topological charges of electron Bessel beams to be controlled. We also characterize the phase structure of the Bessel beams generated with our technique, using a simulation procedure that accounts for imperfections in the hologram manufacturing process. - Highlights: • Bessel beams with different convergence, topological charge, visible fringes are demonstrated. • The relation between the Fresnel hologram and the probe shape is explained by detailed calculations and experiments. • Among the holograms here presented the highest relative efficiency is 37%, the best result ever reached for blazed holograms.

  15. Improvements in or relating to electron beam deflection arrangements

    International Nuclear Information System (INIS)

    Bull, E.W.

    1979-01-01

    This relates to the deflection of ribbon-like electron beams in X-ray tubes particularly in radiographic equipment. The X-ray tubes includes a source of a ribbon-shaped beam of electrons relatively narrow in a direction orthogonal to the direction of the beam and relatively wide in a second orthogonal direction. An elongated target projects X-rays about a chosen direction in response to the incident beam. There is a means (toroidal former, deflection coils or plates) for deflecting the electron beam to scan the region of incidence along the target and correction means for changing the shape of the electron beam depending on the deflection so that the region of incidence of the deflected beam remains a linear region substantially parallel to the region of incidence of the undeflected beam. The apparatus for this, and variations, are described. A medical radiography unit (computerise axial tomography) including the X-ray tube described is also detailed. (U.K.)

  16. Measurement of centroid trajectory of Dragon-I electron beam

    International Nuclear Information System (INIS)

    Jiang Xiaoguo; Wang Yuan; Zhang Wenwei; Zhang Kaizhi; Li Jing; Li Chenggang; Yang Guojun

    2005-01-01

    The control of the electron beam in an intense current linear induction accelerator (LIA) is very important. The center position of the electron beam and the beam profile are two important parameters which should be measured accurately. The setup of a time-resolved measurement system and a data processing method for determining the beam center position are introduced for the purpose of obtaining Dragon-I electron beam trajectory including beam profile. The actual results show that the centroid position error can be controlled in one to two pixels. the time-resolved beam centroid trajectory of Dragon-I (18.5 MeV, 2 kA, 90 ns) is obtained recently in 10 ns interval, 3 ns exposure time with a multi-frame gated camera. The results show that the screw movement of the electron beam is mainly limited in an area with a radius of 0.5 mm and the time-resolved diameters of the beam are 8.4 mm, 8.8 mm, 8.5 mm, 9.3 mm and 7.6 mm. These results have provided a very important support to several research areas such as beam trajectory tuning and beam transmission. (authors)

  17. Electron beam selectively seals porous metal filters

    Science.gov (United States)

    Snyder, J. A.; Tulisiak, G.

    1968-01-01

    Electron beam welding selectively seals the outer surfaces of porous metal filters and impedances used in fluid flow systems. The outer surface can be sealed by melting a thin outer layer of the porous material with an electron beam so that the melted material fills all surface pores.

  18. Electron beam dynamics in Pasotron microwave sources

    International Nuclear Information System (INIS)

    Carmel, Y.; Shkvarunets, A.; Nusinovich, G.S.; Rodgers, J.; Bliokh, Yu.P.; Goebel, D.M.

    2003-01-01

    The Pasotron is a high efficiency (∼50%), plasma-assisted microwave generator in which the beam electrons exhibit two-dimensional motion in the slow wave structure. The electron beam propagates in the ion-focusing regime (Bennett pinch regime) because there is no applied magnetic field. Since initially only the neutral gas is present in the vacuum system and the ions in the neutralizing plasma channel are produced only due to the beam impact ionization, the beam dynamics in Pasotrons is inherently a nonstationary process, and important for efficient operation. The present paper contains results of experimental studies of stationary and nonstationary effects in the beam dynamics in Pasotrons and their theoretical interpretation

  19. Method of determining the position of an irradiated electron beam

    International Nuclear Information System (INIS)

    Fukuda, Wataru.

    1967-01-01

    The present invention relates to the method of determining the position of a radiated electron beam, in particular, the method of detecting the position of a p-n junction by a novel method when irradiating the electron beam on to the semi-conductor wafer, controlling the position of the electron beam from said junction. When the electron beam is irradiated on to the semi-conductor wafer which possesses the p-n junction, the position of the p-n junction may be ascertained to determine the position of the irradiated electron beam by detecting the electromotive force resulting from said p-n junction with a metal disposed in the proximity of but without mechanical contact with said semi-conductor wafer. Furthermore, as far as a semi-conductor wafer having at least one p-n junction is concerned, the present invention allows said p-n junction to be used to determine the position of an irradiated electron beam. Thus, according to the present invention, the electromotive force of the electron beam resulting from the p-n junction may easily be detected by electrostatic coupling, enabling the position of the irradiated electron beam to be accurately determined. (Masui, R.)

  20. Determination of the electron beam irradiated area

    International Nuclear Information System (INIS)

    Zarbout, K.; Kallel, A.; Moya, G.

    2005-01-01

    The investigation of the charge trapping properties of non-conductive materials open the way to an understanding of the degradation of their characteristics due to ageing and catastrophic phenomena, such as breakdown, which originate from the rapid relaxation of trapped charges. The defects, in particular those introduced during the fabrication process, are responsible for the charging phenomena which limit the technological performances and the reliability of these materials. Several characterisation techniques have been developed and among them the one which uses the electron beam of the scanning Electron Microscope (SEM). The study of the charge trapping properties in non-conductive solids by using the electron beam of a SEM requires the knowledge of the current beam and injected charges densities. These densities depend on the irradiated sample area. For this reason, we report in this work two experimental procedures allowing a direct determination of the irradiated area size by the incident defocused beam. The first is based on the charging effect of oxide surfaces (SiO2, MgO, AL2O3) and the second is derived from the electron beam lithography technique. The latter procedure constitutes a convenient experimental method

  1. Study on the electrical and optical properties of Ag/Al-doped ZnO coatings deposited by electron beam evaporation

    International Nuclear Information System (INIS)

    Sahu, D.R.; Lin, S.-Y.; Huang, J.-L.

    2007-01-01

    A layer of silver was deposited onto the surface of glass substrates, coated with AZO (Al-doped ZnO), to form Ag/AZO film structures, using e-beam evaporation techniques. The electrical and optical properties of AZO, Ag and Ag/AZO film structures were studied. The deposition of Ag layer on the surface of AZO films resulted in lowering the effective electrical resistivity with a slight reduction of their optical transmittance. Ag (11 nm)/AZO (25 nm) film structure, with an accuracy of ±0.5 nm for the thickness shows a sheet resistance as low as 5.6 ± 0.5 Ω/sq and a transmittance of about 66 ± 2%. A coating consisting of AZO (25 nm)/Ag (11 nm)/AZO (25 nm) trilayer structure, exhibits a resistance of 7.7 ± 0.5 Ω/sq and a high transmittance of 85 ± 2%. The coatings have satisfactory properties of low resistance, high transmittance and highest figure of merit for application in optoelectronics devices including flat displays, thin films transistors and solar cells as transparent conductive electrodes

  2. Beam-plasma interaction with an electron beam injecting into a symmetrically open plasma system; Electron beam relaxation. Puchkovo-plazmennoe vzaimodejstvie pri inzhektsii ehlektronnogo puchka v simmetrichno otkrytuyu plazmennuyu sistemu; Relaksatsiya ehlektronnogo puchka

    Energy Technology Data Exchange (ETDEWEB)

    Opanasenko, A V; Romanyuk, L I [AN Ukrainskoj SSR, Kiev (Ukrainian SSR). Inst. Yadernykh Issledovanij

    1989-10-01

    The relaxation of the electron beam with the electron density of 1-2 keV injected through the symmetrically open plasma system with the independent hot cathode Penning discharge is experimentally investigated. It is shown that the velocity distribution function of the electron beam changes after passing each wave generation zone induced by the beam. The contribution of different wave zones to the beam relaxation depends on the prehistory of the beam-plasma interaction and may be regulated by the selection of the plasma system parameters. By this way the complete relaxation of the electron beam can be achieved after the beam crossing the whole system.

  3. Electron and ion beam transport to fusion targets

    International Nuclear Information System (INIS)

    Freeman, J.R.; Baker, L.; Miller, P.A.; Mix, L.P.; Olsen, J.N.; Poukey, J.W.; Wright, T.P.

    1979-01-01

    ICF reactors have been proposed which incorporate a gas-filled chamber to reduce x-ray and debris loading of the first wall. Focused beams of either electrons or ions must be transported efficiently for 2-4 m to a centrally located fusion target. Laser-initiated current-carrying plasma discharge channels provide the guiding magnetic field and the charge- and current-neutralizing medium required for beam propagation. Computational studies of plasma channel formation in air using a 1-D MHD model with multigroup radiation diffusion have provided a good comparison with the expansions velocity and time dependent refractivity profile determined by holographic interferometry. Trajectory calculations have identified a beam expansion mechanism which combines with the usual ohmic dissipation to reduce somewhat the transported beam fluence for electrons. Additional trajectory calculations have been performed for both electrons and light ions to predict the limits on the particle current density which can be delivered to a central target by overlapping the many independently-generated beams. Critical features of the use of plasma channels for transport and overlap of charged particle beams are being tested experimentally with up to twelve electron beams from the Proto II accelerator

  4. Beam profile for Malaysian electron accelerator

    International Nuclear Information System (INIS)

    Abu Bakar Ghazali; Muhamad Zahidee Taat

    2007-01-01

    This paper comprises of two calculations that require in designing a dose profile for an electron accelerator machine before its fabrication. The first is to calculate the beam deflection due to changes of high voltage (HV) supply as well as the deflection coil currents so that the electron beam will only scan at the window foil of 18 cm length and 6 cm width. Secondly, we also require to calculate the beam profile at 50 mm underneath the window foil. The electron gun that produces a beam of 10 mm diameter has to be oscillated in a sawtooth wave for the prescribed window size at frequencies of 50 Hz and 400 Hz along the length and width directions respectively. For the beam deflection, we apply a basic formula from Lorentz force law to obtain a set of HV supply and the coil current that is suitable for both deflections and this result can assist in designing the coil current against HV changes via an electronic controller. The dose profile was calculated using the RMS current formulation along the length direction. We found that the measured and the calculated RMS currents are in comparable for the case of 1 MeV, 50 mA accelerator facility that is going to be installed at Nuclear Malaysia complex. A similar measurement will be carried out for our locally designed accelerator of 150 KeV, 10 mA after fabrication and installation of the machine are completed. (Author)

  5. Characterization and control of femtosecond electron and X-ray beams at free-electron lasers

    International Nuclear Information System (INIS)

    Behrens, Christopher

    2012-11-01

    X-ray free-electron lasers (FELs) open up new frontiers in photon science, and in order to take full advantage of these unique accelerator-based light sources, the characterization and control of the femtosecond electron and X-ray beams is essential. Within this cumulative thesis, recent results achieved within the active research field of femtosecond electron and X-ray beams at FELs are reported.The basic principles of X-ray FELs are described, and concepts of longitudinal electron beam diagnostics with femtosecond accuracy are covered. Experimental results obtained with a transverse deflecting structure (TDS) and spectroscopy of coherent terahertz radiation are presented, and the suppression of coherent optical radiation effects, required for diagnostics utilizing a TDS, is demonstrated. Control of the longitudinal phase space by using multiple radio frequencies for longitudinal electron beam tailoring is presented, and a new technique of reversible electron beam heating with two TDSs is described. For the characterization of femtosecond X-ray pulses, a novel method based on dedicated longitudinal phase space diagnostics for electron beams is introduced, and recent measurements with a streaking technique using external terahertz fields are presented.

  6. Characterization and control of femtosecond electron and X-ray beams at free-electron lasers

    Energy Technology Data Exchange (ETDEWEB)

    Behrens, Christopher

    2012-11-15

    X-ray free-electron lasers (FELs) open up new frontiers in photon science, and in order to take full advantage of these unique accelerator-based light sources, the characterization and control of the femtosecond electron and X-ray beams is essential. Within this cumulative thesis, recent results achieved within the active research field of femtosecond electron and X-ray beams at FELs are reported.The basic principles of X-ray FELs are described, and concepts of longitudinal electron beam diagnostics with femtosecond accuracy are covered. Experimental results obtained with a transverse deflecting structure (TDS) and spectroscopy of coherent terahertz radiation are presented, and the suppression of coherent optical radiation effects, required for diagnostics utilizing a TDS, is demonstrated. Control of the longitudinal phase space by using multiple radio frequencies for longitudinal electron beam tailoring is presented, and a new technique of reversible electron beam heating with two TDSs is described. For the characterization of femtosecond X-ray pulses, a novel method based on dedicated longitudinal phase space diagnostics for electron beams is introduced, and recent measurements with a streaking technique using external terahertz fields are presented.

  7. Measurements on wave propagation characteristics of spiraling electron beams

    Science.gov (United States)

    Singh, A.; Getty, W. D.

    1976-01-01

    Dispersion characteristics of cyclotron-harmonic waves propagating on a neutralized spiraling electron beam immersed in a uniform axial magnetic field are studied experimentally. The experimental setup consisted of a vacuum system, an electron-gun corkscrew assembly which produces a 110-eV beam with the desired delta-function velocity distribution, a measurement region where a microwave signal is injected onto the beam to measure wavelengths, and a velocity analyzer for measuring the axial electron velocity. Results of wavelength measurements made at beam currents of 0.15, 1.0, and 2.0 mA are compared with calculated values, and undesirable effects produced by increasing the beam current are discussed. It is concluded that a suitable electron beam for studies of cyclotron-harmonic waves can be generated by the corkscrew device.

  8. Substrate bias effect on crystallinity of polycrystalline silicon thin films prepared by pulsed ion-beam evaporation method

    Energy Technology Data Exchange (ETDEWEB)

    Ali, Fazlat; Gunji, Michiharu; Yang, Sung-Chae; Suzuki, Tsuneo; Suematsu, Hisayuki; Jiang, Weihua; Yatsui, Kiyoshi [Nagaoka Univ. of Technology, Extreme Energy-Density Research Inst., Nagaoka, Niigata (Japan)

    2002-06-01

    The deposition of polycrystalline silicon thin films has been tried by a pulsed ion-beam evaporation method, where high crystallinity and deposition rate have been achieved without heating the substrate. The crystallinity and the deposition rate were improved by applying bias voltage to the substrate, where instantaneous substrate heating might have occurred by ion-bombardment. (author)

  9. Substrate bias effect on crystallinity of polycrystalline silicon thin films prepared by pulsed ion-beam evaporation method

    International Nuclear Information System (INIS)

    Ali, Fazlat; Gunji, Michiharu; Yang, Sung-Chae; Suzuki, Tsuneo; Suematsu, Hisayuki; Jiang, Weihua; Yatsui, Kiyoshi

    2002-01-01

    The deposition of polycrystalline silicon thin films has been tried by a pulsed ion-beam evaporation method, where high crystallinity and deposition rate have been achieved without heating the substrate. The crystallinity and the deposition rate were improved by applying bias voltage to the substrate, where instantaneous substrate heating might have occurred by ion-bombardment. (author)

  10. Radial electron beam laser excitation: the REBLE report

    International Nuclear Information System (INIS)

    Ramirez, J.J.; Prestwich, K.R.

    1978-10-01

    The results of an investigation of techniques to generate high-power radially converging electron beams and the application of these beams to gas lasers is discussed. The design and performance of the REBLE accelerator that was developed for this program is presented. Reliable operation of the radial diode has been obtained at levels up to 1 MV, 200 kA, and 20 ns. It has been demonstrated that the anode current density can be made uniform to better than 15% over 1000 cm 2 areas with 100 to 250 A/cm 2 intensities. The measured total and spatially resolved energy deposition of this radial electron beam in various gases is compared with Monte Carlo calculations. In most cases, these codes give an accurate description of the beam transport and energy deposition. With the electron beam pumping xenon gas, the amplitude of xenon excimer radiation (1720 A 0 ) was radially uniform to within the experimental uncertainty. The efficiency of converting deposited electron beam energy to xenon excimer radiation was 20%

  11. Physics with polarized electron beams

    International Nuclear Information System (INIS)

    Swartz, M.L.

    1988-06-01

    As a distinct field, elementary particle physics is now approximately forty years old. In all that time, only a few of the thousands of experiments that have been performed have made use of spin polarized particle beams. There are two reasons for this lack of interest. The first is that spin polarized beams are difficult to produce, accelerate, and transport. The second reason is that any physical process that can occur during the collision of a polarized particle with another (polarized or not) can also occur during the collision of unpolarized particles. One might ask then, why has any effort been expended on the subject? The answer, at least in the case of polarized electron beams, is that electron accelerators and storage rings have in recent years achieved sufficient energy to begin to probe the weak interaction directly. The weak interaction distinguishes between left- and right-handed fermionic currents. Left-handed particles interact in a fundamentally different way than their right-handed counterparts. If the experimenter wishes to explore or exploit this difference, he (or she) must either prepare the spin state of the incident particles or analyze the spin state of outgoing particles. For reasons, of generality and improved statistical precision, the former is usually preferable to the latter. The first of these lectures will review some of the techniques necessary for the production, transport, and monitoring of polarized electron (or positron) beams. The second lecture will survey some of the physics possibilities of polarized electron--positron collisions. 33 refs., 26 figs., 5 tabs

  12. Investigations of electron beams from a linear accelerator

    International Nuclear Information System (INIS)

    Sweeney, L.E.

    1981-01-01

    The use of high energy electron beams from linear accelerators is becoming more prevalent in Radiation Therapy clinics. Although the basic interactions of electrons in material have been described for many years, the use of the high energy electron beams is based mostly upon measurements in the clinical setting. It is the purpose of this work to experimentally study the physical properties and apply basic concepts to analyze these measurements. Three different topics are addressed in this work. The distance to the virtual source of the electron beam is determined by a series of ionization measurements in air and in a plastic phantom as a function of distance from the accelerator. Scattering effects of the x-ray collimators and electron applicators play an important role in the clinical evaluation of the distance to the virtual source as well as the energy of the electron beam. The ionization distribution of a narrow beam of 21 MeV electrons is measured and compared to theoretical calculations. The transverse ionization distribution is measured in a water phantom and compared with Monte Carlo calculation for this energy. The depth dose distribution is measured in two distinct geometrical configurations and found to be analogous within the errors of measurement. Depth ionization and depth dose properties of a broad 21 MeV electron beam are determined for a number of homogeneous materials having different physical properties. Comparison of these measurements are described by two different scaling factors for polystyrene, water, teflon, and aluminum phantom materials. Basic physical interactions, experimental techniques and results are discussed

  13. Design of automatic tracking system for electron beam welding

    International Nuclear Information System (INIS)

    He Chengdan; Chinese Academy of Space Technology, Lanzhou; Li Heqi; Li Chunxu; Ying Lei; Luo Yan

    2004-01-01

    The design and experimental process of an automatic tracking system applied to local vacuum electron beam welding are dealt with in this paper. When the annular parts of an exactitude apparatus were welded, the centre of rotation of the electron gun and the centre of the annular weld are usually not superposed because of the machining error, workpiece's setting error and so on. In this teaching process, a little bundle of electron beam is used to scan the weld groove, the amount of the secondary electrons reflected from the workpiece is different when the electron beam scans the both sides and the centre of the weld groove. The difference can indicate the position of the weld and then a computer will record the deviation between the electron beam spot and the centre of the weld groove. The computer will analyze the data and put the data into the storage software. During the welding process, the computer will modify the position of the electron gun based on the deviation to make the electron beam spot centered on the annular weld groove. (authors)

  14. Economy in utilizing electron beam accelerators

    International Nuclear Information System (INIS)

    Takahashi, Masao

    1980-01-01

    As the typical industrialized processes using electron beam irradiation, the following items may be given: the manufacture of cables covered with cross-linking polyethylene or PVC, heat-contracting material, cross-linking polyethylene foam, etc., and the curing of coatings or surface finishes. The results of investigating economy in these processes are described. First, the running cost of electron beam irradiation equipments is calculated. The result shows that, in general, the unit cost of the equipments becomes small with increasing output, therefore the selection of large power equipments may be advantageous for economy. Other important factors concerning the equipments are the reliability and lifetime which are being improved every year and the improvement of the operational efficiency of the equipments. Next, the comparison of cost was made for each industrialized process of the cables covered with cross-linking polyethylene, polyethylene foam, and the curing of coatings. In general, the processing cost is smaller and the depreciation cost is larger in electron beam irradiation process as compared with conventional processes. In addition, since the productive capacity is larger in electron beam process it is preponderant when the amount of production is large. In the industrialized examples, unique processes or features which are not obtainable by other methods are attained. (Wakatsuki, Y.)

  15. Dependence of electron beam instability growth rates on the beam-plasma system parameters

    International Nuclear Information System (INIS)

    Strangeway, R.J.

    1982-01-01

    Electron beam instabilites are studied by using a simple model for an electron beam streaming through a cold plasma, the beam being of finite width perpendicular to the ambient magnetic field. Through considerations of finite geometry and the coldness of the beam and background plasma, an instability similar to the two stream instability is assumed to be the means for wave growth in the system. Having found the maximum growth rate for one set of beam-plasma system parameters, this maximum growth rate is traced as these parameters are varied. The parameters that describe the system are the beam velocity (v/sub b/), electron gyrofrequency to ambient electron plasma frequency ratio (Ω/sub e//ω/sub p/e), the beam to background number density ratio (n/sub b//n/sub a/), and the beam width (a). When Ω/sub e//ω/sub p/e>1, a mode with Ω/sub e/<ω<ω/sub u/hr is found to be unstable, where Ω is the wave frequency and ω/sub u/hr is the upper hybrid resonance frequency. For low values of n/sub b//n/sub a/ and Ω/sub e/<ω/sub p/e, this mode is still present with ω/sub p/e<ω<ω/sub u/hr. If the beam density is large, n/sub b//n/sub a/approx. =1, the instability occures for frequencies just above the electron gyrofrequency. This mode may well be that observed in laboratory plasma before the system undergoes the beam-plasma discharge. There is another instability present, which occurs for ωapprox. =ω/sub p/e. The growth rates for this mode, which are generally larger than those found for the ωapprox. =ωuhr mode, are only weakly dependent on Ω/sub d//ω/sub p/e. That this mode is not always observed in the laboratory implies that some factors not considered in the present theory suppress this mode, specifically, finite beam length

  16. Current-Voltage Characteristic of Nanosecond - Duration Relativistic Electron Beam

    Science.gov (United States)

    Andreev, Andrey

    2005-10-01

    The pulsed electron-beam accelerator SINUS-6 was used to measure current-voltage characteristic of nanosecond-duration thin annular relativistic electron beam accelerated in vacuum along axis of a smooth uniform metal tube immersed into strong axial magnetic field. Results of these measurements as well as results of computer simulations performed using 3D MAGIC code show that the electron-beam current dependence on the accelerating voltage at the front of the nanosecond-duration pulse is different from the analogical dependence at the flat part of the pulse. In the steady-state (flat) part of the pulse), the measured electron-beam current is close to Fedosov current [1], which is governed by the conservation law of an electron moment flow for any constant voltage. In the non steady-state part (front) of the pulse, the electron-beam current is higher that the appropriate, for a giving voltage, steady-state (Fedosov) current. [1] A. I. Fedosov, E. A. Litvinov, S. Ya. Belomytsev, and S. P. Bugaev, ``Characteristics of electron beam formed in diodes with magnetic insulation,'' Soviet Physics Journal (A translation of Izvestiya VUZ. Fizika), vol. 20, no. 10, October 1977 (April 20, 1978), pp.1367-1368.

  17. High energy gain electron beam acceleration by 100TW laser

    International Nuclear Information System (INIS)

    Kotaki, Hideyuki; Kando, Masaki; Kondo, Shuji; Hosokai, Tomonao; Kanazawa, Shuhei; Yokoyama, Takashi; Matoba, Toru; Nakajima, Kazuhisa

    2001-01-01

    A laser wakefield acceleration experiment using a 100TW laser is planed at JAERI-Kansai. High quality and short pulse electron beams are necessary to accelerate the electron beam by the laser. Electron beam - laser synchronization is also necessary. A microtron with a photocathode rf-gun was prepared as a high quality electron injector. The quantum efficiency (QE) of the photocathode of 2x10 -5 was obtained. A charge of 100pC from the microtron was measured. The emittance and pulse width of the electron beam was 6π mm-mrad and 10ps, respectively. In order to produce a short pulse electron beam, and to synchronize between the electron beam and the laser pulse, an inverse free electron laser (IFEL) is planned. One of problems of LWFA is the short acceleration length. In order to overcome the problem, a Z-pinch plasma waveguide will be prepared as a laser wakefield acceleration tube for 1 GeV acceleration. (author)

  18. Interaction of the Modulated Electron Beam with Plasma: Kinetic Effects

    International Nuclear Information System (INIS)

    Anisimov, I.O.; Kiyanchuk, M.J.; Soroka, S.V.; Velikanets', D.M.

    2006-01-01

    Evolution of the velocity distribution functions of plasma and beam electrons during modulated electron beam propagation in homogeneous and inhomogeneous plasmas was studied numerically. Velocity distribution function of plasma electrons at the late time moments strongly differs from the initially Maxwellian one. In the regions of strong electric field plasma electrons' bunches are formed. Comparison of distribution functions of beam electrons for modulated and non-modulated beams shows that deep initial modulation suppresses resonant instability development. In the inhomogeneous plasma acceleration of electrons in the plasma resonance point can be observed

  19. Terahertz electron cyclotron maser interactions with an axis-encircling electron beam

    Science.gov (United States)

    Li, G. D.; Kao, S. H.; Chang, P. C.; Chu, K. R.

    2015-04-01

    To generate terahertz radiation via the electron cyclotron maser instability, harmonic interactions are essential in order to reduce the required magnetic field to a practical value. Also, high-order mode operation is required to avoid excessive Ohmic losses. The weaker harmonic interaction and mode competition associated with an over-moded structure present challenging problems to overcome. The axis-encircling electron beam is a well-known recipe for both problems. It strengthens the harmonic interaction, as well as minimizing the competing modes. Here, we examine these advantages through a broad data base obtained for a low-power, step-tunable, gyrotron oscillator. Linear results indicate far more higher-harmonic modes can be excited with an axis-encircling electron beam than with an off-axis electron beam. However, multi-mode, time-dependent simulations reveal an intrinsic tendency for a higher-harmonic mode to switch over to a lower-harmonic mode at a high beam current or upon a rapid current rise. Methods are presented to identify the narrow windows in the parameter space for stable harmonic interactions.

  20. Terahertz electron cyclotron maser interactions with an axis-encircling electron beam

    International Nuclear Information System (INIS)

    Li, G. D.; Kao, S. H.; Chang, P. C.; Chu, K. R.

    2015-01-01

    To generate terahertz radiation via the electron cyclotron maser instability, harmonic interactions are essential in order to reduce the required magnetic field to a practical value. Also, high-order mode operation is required to avoid excessive Ohmic losses. The weaker harmonic interaction and mode competition associated with an over-moded structure present challenging problems to overcome. The axis-encircling electron beam is a well-known recipe for both problems. It strengthens the harmonic interaction, as well as minimizing the competing modes. Here, we examine these advantages through a broad data base obtained for a low-power, step-tunable, gyrotron oscillator. Linear results indicate far more higher-harmonic modes can be excited with an axis-encircling electron beam than with an off-axis electron beam. However, multi-mode, time-dependent simulations reveal an intrinsic tendency for a higher-harmonic mode to switch over to a lower-harmonic mode at a high beam current or upon a rapid current rise. Methods are presented to identify the narrow windows in the parameter space for stable harmonic interactions

  1. High current precision long pulse electron beam position monitor

    CERN Document Server

    Nelson, S D; Fessenden, T J; Holmes, C

    2000-01-01

    Precision high current long pulse electron beam position monitoring has typically experienced problems with high Q sensors, sensors damped to the point of lack of precision, or sensors that interact substantially with any beam halo thus obscuring the desired signal. As part of the effort to develop a multi-axis electron beam transport system using transverse electromagnetic stripline kicker technology, it is necessary to precisely determine the position and extent of long high energy beams for accurate beam position control (6 - 40 MeV, 1 - 4 kA, 2 μs beam pulse, sub millimeter beam position accuracy.) The kicker positioning system utilizes shot-to-shot adjustments for reduction of relatively slow (< 20 MHz) motion of the beam centroid. The electron beams passing through the diagnostic systems have the potential for large halo effects that tend to corrupt position measurements.

  2. Nonlinear electron-acoustic rogue waves in electron-beam plasma system with non-thermal hot electrons

    Science.gov (United States)

    Elwakil, S. A.; El-hanbaly, A. M.; Elgarayh, A.; El-Shewy, E. K.; Kassem, A. I.

    2014-11-01

    The properties of nonlinear electron-acoustic rogue waves have been investigated in an unmagnetized collisionless four-component plasma system consisting of a cold electron fluid, non-thermal hot electrons obeying a non-thermal distribution, an electron beam and stationary ions. It is found that the basic set of fluid equations is reduced to a nonlinear Schrodinger equation. The dependence of rogue wave profiles on the electron beam and energetic population parameter are discussed. The results of the present investigation may be applicable in auroral zone plasma.

  3. Derivation of electron and photon energy spectra from electron beam central axis depth dose curves

    Energy Technology Data Exchange (ETDEWEB)

    Deng Jun [Department of Radiation Oncology, Stanford University School of Medicine, Stanford, CA 94305 (United States)]. E-mail: jun@reyes.stanford.edu; Jiang, Steve B.; Pawlicki, Todd; Li Jinsheng; Ma, C.M. [Department of Radiation Oncology, Stanford University School of Medicine, Stanford, CA 94305 (United States)

    2001-05-01

    A method for deriving the electron and photon energy spectra from electron beam central axis percentage depth dose (PDD) curves has been investigated. The PDD curves of 6, 12 and 20 MeV electron beams obtained from the Monte Carlo full phase space simulations of the Varian linear accelerator treatment head have been used to test the method. We have employed a 'random creep' algorithm to determine the energy spectra of electrons and photons in a clinical electron beam. The fitted electron and photon energy spectra have been compared with the corresponding spectra obtained from the Monte Carlo full phase space simulations. Our fitted energy spectra are in good agreement with the Monte Carlo simulated spectra in terms of peak location, peak width, amplitude and smoothness of the spectrum. In addition, the derived depth dose curves of head-generated photons agree well in both shape and amplitude with those calculated using the full phase space data. The central axis depth dose curves and dose profiles at various depths have been compared using an automated electron beam commissioning procedure. The comparison has demonstrated that our method is capable of deriving the energy spectra for the Varian accelerator electron beams investigated. We have implemented this method in the electron beam commissioning procedure for Monte Carlo electron beam dose calculations. (author)

  4. Electron beam melting state-of-the-art 1984

    International Nuclear Information System (INIS)

    Bakish, R.

    1984-01-01

    In 1984 electron beam melting and refining appear poised for an important new growth phase. The driving force for this phase is improved production economics made possible by technological advances. There is also a new and exciting growth application for electron beam melting: its use for surface properties beneficiation. This article is based in part on the content of the Conference on Electron Beam Melting and Refining, The State-of-the-Art 1983, held in November 1983 in Reno, Nevada

  5. Generation of mega-electron-volt electron beams by an ultrafast intense laser pulse

    International Nuclear Information System (INIS)

    Wang Xiaofang; Saleh, Ned; Krishnan, Mohan; Wang Haiwen; Backus, Sterling; Murnane, Margaret; Kapteyn, Henry; Umstadter, Donald; Wang Quandong; Shen Baifei

    2003-01-01

    Mega-electron-volt (MeV) electron emission from the interaction of an ultrafast (τ∼29 fs), intense (>10 18 W/cm 2 ) laser pulse with underdense plasmas has been studied. A beam of MeV electrons with a divergence angle as small as 1 deg. is observed in the forward direction, which is correlated with relativistic filamentation of the laser pulse in plasmas. A novel net-energy-gain mechanism is proposed for electron acceleration resulting from the relativistic filamentation and beam breakup. These results suggest an approach for generating a beam of femtosecond, MeV electrons at a kilohertz repetition rate with a compact ultrafast intense laser system

  6. UV laser ionization and electron beam diagnostics for plasma lenses

    International Nuclear Information System (INIS)

    Govil, R.; Volfbeyn, P.; Leemans, W.

    1995-04-01

    A comprehensive study of focusing of relativistic electron beams with overdense and underdense plasma lenses requires careful control of plasma density and scale lengths. Plasma lens experiments are planned at the Beam Test Facility of the LBL Center for Beam Physics, using the 50 MeV electron beam delivered by the linac injector from the Advanced Light Source. Here we present results from an interferometric study of plasmas produced in tri-propylamine vapor with a frequency quadrupled Nd:YAG laser at 266 nm. To study temporal dynamics of plasma lenses we have developed an electron beam diagnostic using optical transition radiation to time resolve beam size and divergence. Electron beam ionization of the plasma has also been investigated

  7. Analysis of emissions from prebunched electron beams

    Directory of Open Access Journals (Sweden)

    Jia Qika

    2017-07-01

    Full Text Available The emissions of the prebunched electron beam, including the coherent spontaneous emission and the self-amplified stimulated emission, are analyzed by using one-dimensional FEL theory. Neglecting the interaction of the electrons and the radiation field, the formula of the coherent spontaneous emission is given, the power of which is proportional to the square of the initial bunching factor and of the undulator length. For the general emission case of the prebunched electron beam, the evolution equation of the optical field is deducted. Then the analytical expression of the emission power is obtained for the resonant case; it is applicable to the regions from the low gain to the high gain. It is found that when the undulator length is shorter than four gain lengths, the emission is just the coherent spontaneous emission, and conversely, it is the self-amplified stimulated emission growing exponentially. For the nonresonant prebunched electron beam, the variations of the emission intensity with the detuning parameter for different interaction length are presented. The radiation field characters of the prebunched electron beam are discussed and compared with that of the seeded FEL amplifier.

  8. Electron-beam induced conduction in some polymers

    International Nuclear Information System (INIS)

    Suzuoki, Yasuo; Mizutani, Teruyoshi; Ieda, Masayuki

    1976-01-01

    The charge signal induced by pulsed electron beam consists of two components, i.e. the fast and the slow components. The slow component which corresponds to carrier transport via shallow traps exhibited an asymmetry with respect to the bias field polarity. The asymmetry revealed that the main carriers which drifted via shallow traps were electrons in PET, both electrons and holes in PEN, and holes in PS. TSC spectra of electron-beam induced electrets proved directly the existence of electron shallow traps in PET and both electron and hole traps in PEN. Their trap energies were 0.1 to 0.2 eV. (auth.)

  9. Preliminary experiments on a planar electron beam for an intense free electron maser

    International Nuclear Information System (INIS)

    Kato, Katsumasa; Iwata, Kazuma; Kitamura, Taro; Yamada, Naohisa; Soga, Yukihiro; Kamada, Keiichi; Yoshida, Mitsuhiro; Ginzburg, Naum S.

    2013-01-01

    A planar wiggler magnetic field was used to increase the output power of an intense free electron maser. As a preliminary experiment, a cylindrical electron beam was injected into a planar wiggler field with an axial magnetic field. Without the axial magnetic field, the cylindrical beam could not propagate through the wiggler field with length of 1 m. The microwave with frequency of 40 GHz was observed only when the beam propagates through the wiggler field. The frequency was nearly equal to the expected frequency of the free electron maser interaction. Though a sheet electron beam with nearly the same energy propagated through the planar wiggler field with deformation of its cross section, the microwave with frequency of 40 GHz was not observed. (author)

  10. Study the effect of ion-complex on the properties of composite gel polymer electrolyte based on Electrospun PVdF nanofibrous membrane

    International Nuclear Information System (INIS)

    Li, Weili; Xing, Yujin; Wu, Yuhui; Wang, Jiawei; Chen, Lizhuang; Yang, Gang; Tang, Benzhong

    2015-01-01

    In this paper, nanofibrous membranes based on poly(vinylidene fluoride) (PVdF) doped with ion-complex (SiO 2 -PAALi) were prepared by electrospinning technique and the corresponding composite gel-polymer electrolytes (CGPEs) were obtained after being activated in liquid electrolyte. The microstructure, physical and electrochemical performances of the nanofibrous membranes and the corresponding CGPEs were studied by various measurements such as Fourier Transform Infrared Spectroscopy(FTIR), Scanning Electron Microscope (SEM), Differential Scanning Calorimetry (DSC), Thermal Gravimetric Analysis (TGA), Stress-strain test, Linear Sweep Voltammetry (LSV), AC impedance measurement and Charge/discharge cycle test. As to the ion-complex doped nanofibrous membranes, PVdF can provide mechanical support with network structure composed of fully interconnection; while the ion-complexes are absorbed onto the surface of the PVdF nanofibers evenly instead of being aggregated. With the help of doped ion-complex, the prepared nanofibrous membranes present good liquid electrolyte absorbability, excellent mechanical performance, and high decomposition temperature. For the corresponding CGPEs, they possess high ionic conductivity, wide electrochemical window, and good charge/discharge cycle performance

  11. Measurement of an electron-beam size with a beam profile monitor using Fresnel zone plates

    International Nuclear Information System (INIS)

    Iida, K.; Nakamura, N.; Sakai, H.; Shinoe, K.; Takaki, H.; Fujisawa, M.; Hayano, H.; Nomura, M.; Kamiya, Y.; Koseki, T.; Amemiya, Y.; Aoki, N.; Nakayama, K.

    2003-01-01

    We present a non-destructive and real-time beam profile monitor using Fresnel zone plates (FZPs) and the measurement of an electron-beam size with this monitor in the KEK-Accelerator Test Facility (ATF) damping ring. The monitor system has the structure of a long-distance X-ray microscope, where two FZPs constitute an X-ray imaging optics. The synchrotron radiation from the electron beam at the bending magnet is monochromatized by a crystal monochromator and the transverse electron beam image is twenty times magnified by the two FZPs and detected on an X-ray CCD camera. The expected spatial resolution for the selected photon energy of 3.235 keV is sufficiently high to measure the horizontal and vertical beam sizes of the ATF damping ring. With the beam profile monitor, we succeeded in obtaining a clear electron-beam image and measuring the extremely small beam size less than 10 μm. The measured magnification of the X-ray imaging optics in the monitor system was in good agreement with the design value

  12. PVD Ti coatings on Sm-Co magnets

    International Nuclear Information System (INIS)

    Bovda, O.M.; Bovda, V.O.; Garkusha, I.E.; Leonov, S.O.; Onishchenko, L.V.; Tereshin, V.I.; Totrika, O.S.; Chen, C.H.

    2008-01-01

    The combination of conventional ion-plasma deposition (PVD) and pulsed plasma technologies (PPT) has been applied for rare-earth Sm-Co based magnets, to provide them with enhanced corrosion resistance. The influence of pulsed plasma treatment on Sm-Co magnets with deposited titanium PVD coatings has been investigated. It was revealed that thickness of modified layer significantly depends on the thickness of initial titanium film and plasma treatment regimes. As a result of plasma treatment with energy density of 30 J/cm 2 and pulse duration of ∼ 5 μs fine-grained layer with the thickness of 70 microns has been formed on the Sm-Co magnet with pure titanium film of 50 micron. According to SEM analyses considerable diffusion of titanium to the bulk of the magnet, on the depth of 20 microns, took place. Such reaction enhances strong bonding between the coating and the magnet

  13. Optimisation of electron beam characteristics by simulated annealing

    International Nuclear Information System (INIS)

    Ebert, M.A.; University of Adelaide, SA; Hoban, P.W.

    1996-01-01

    Full text: With the development of technology in the field of treatment beam delivery, the possibility of tailoring radiation beams (via manipulation of the beam's phase space) is foreseeable. This investigation involved evaluating a method for determining the characteristics of pure electron beams which provided dose distributions that best approximated desired distributions. The aim is to determine which degrees of freedom are advantageous and worth pursuing in a clinical setting. A simulated annealing routine was developed to determine optimum electron beam characteristics. A set of beam elements are defined at the surface of a homogeneous water equivalent phantom defining discrete positions and angles of incidence, and electron energies. The optimal weighting of these elements is determined by the (generally approximate) solution to the linear equation, Dw = d, where d represents the dose distribution calculated over the phantom, w the vector of (50 - 2x10 4 ) beam element relative weights, and D a normalised matrix of dose deposition kernels. In the iterative annealing procedure, beam elements are randomly selected and beam weighting distributions are sampled and used to perturb the selected elements. Perturbations are accepted or rejected according to standard simulated annealing criteria. The result (after the algorithm has terminated due to meeting an iteration or optimisation specification) is an approximate solution for the beam weight vector (w) specified by the above equation. This technique has been applied for several sample dose distributions and phase space restrictions. An example is given of the phase space obtained when endeavouring to conform to a rectangular 100% dose region with polyenergetic though normally incident electrons. For regular distributions, intuitive conclusions regarding the benefits of energy/angular manipulation may be made, whereas for complex distributions, variations in intensity over beam elements of varying energy and

  14. Electron beam hardening type copper plate printing ink

    International Nuclear Information System (INIS)

    Kawamura, Eiji; Inoue, Mitsuo; Kusaki, Satoichiro

    1989-01-01

    Copper plate printing is the printing method of filling ink in the parts of concave printing elements on a type area, and transferring the ink to a base, and it is the feature that the ink in the printing element parts of a print rises. Copper plate prints show profound feeling, in addition, its effect of preventing forgery is high. This method is generally called engraving printing, and is used frequently for printing various bills and artistic prints. The electron beam irradiation apparatus installed in the laboratory of the Printing Bureau, Ministry of Finance, is an experimental machine of area beam type, and is so constructed as to do batch conveyance and web conveyance. As the ink in printing element parts rises, the offset at the delivery part of a printing machine becomes a problem. Electron beam is superior in its transparency, and can dry instantaneously to the inside of opaque ink. At 200 kV of acceleration voltage, the ink of copper plate prints can be hardened by electron beam irradiation. The dilution monomers as the vehicle for ink were tested for their dilution capability and the effect of electron beam hardening. The problem in the utilization of electron beam is the deterioration of papers, and the counter-measures were tested. (K.I.)

  15. Effect of electron beam on in vitro cultured orchid organs

    Energy Technology Data Exchange (ETDEWEB)

    Ryu, Jaihyunk; Bae, Seho; Bae, Changhyu [Sunchon National Univ., Suncheon (Korea, Republic of); Kang, Hyun Suk; Lee, Byung Cheol [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

    2010-07-01

    Ionizing radiations have been effective mutagen sources to overcome the limitation of the useful genetic resources in natural environment. The study was conducted to investigate an effect of electron beam on organogenesis, growth patterns and genetic variation in the irradiated orchid organs. The in utero cultured rhizomes of orchids were irradiated with the electron beam in the dose range of 15Gy to 2240Gy under the condition of various beam energy and beam current. Significant decreases in survival, growth and organogenesis were observed by increase of intensity of electron beam irradiation. The irradiation intensity of lethal dose 50 of the in utero cultured orchid was estimated as approximately 500Gy to 1000Gy under 10MeV/n, and 1000Gy was optimal for growth and organogenesis of the cultures under 10MeV/n with 0.05mA treatment, and 15Gy {approx} 48Gy under 2MeV/n and 0.5mA electron beam condition. RAPD and ISSR analyses for the electron beam irradiated organs were performed to analyze genetic variation under the electron beam condition. Both of RAPD and ISSR analyses showed higher polymorphic rate in the electron-beam irradiated C. gangrene and C. Kaner.

  16. Comparison of the secondary electrons produced by proton and electron beams in water

    Energy Technology Data Exchange (ETDEWEB)

    Kia, Mohammad Reza, E-mail: m-r-kia@aut.ac.ir; Noshad, Houshyar [Department of Energy Engineering and Physics, Amirkabir University of Technology (Tehran Polytechnic), P.O. Box 15875-4413, Hafez Avenue, Tehran (Iran, Islamic Republic of)

    2016-05-15

    The secondary electrons produced in water by electron and proton beams are compared with each other. The total ionization cross section (TICS) for an electron impact in water is obtained by using the binary-encounter-Bethe model. Hence, an empirical equation based on two adjustable fitting parameters is presented to determine the TICS for proton impact in media. In order to calculate the projectile trajectory, a set of stochastic differential equations based on the inelastic collision, elastic scattering, and bremsstrahlung emission are used. In accordance with the projectile trajectory, the depth dose deposition, electron energy loss distribution in a certain depth, and secondary electrons produced in water are calculated. The obtained results for the depth dose deposition and energy loss distribution in certain depth for electron and proton beams with various incident energies in media are in excellent agreement with the reported experimental data. The difference between the profiles for the depth dose deposition and production of secondary electrons for a proton beam can be ignored approximately. But, these profiles for an electron beam are completely different due to the effect of elastic scattering on electron trajectory.

  17. 500 MHz narrowband beam position monitor electronics for electron synchrotrons

    International Nuclear Information System (INIS)

    Mohos, I.; Dietrich, J.

    1998-01-01

    Narrowband beam position monitor electronics were developed in the Forschungszentrum Juelich-IKP for the orbit measurement equipment used at ELSA Bonn. The equipment uses 32 monitor chambers, each with four capacitive button electrodes. The monitor electronics, consisting of an rf signal processing module (BPM-RF) and a data acquisition and control module (BPM-DAQ), sequentially process and measure the monitor signals and deliver calculated horizontal and vertical beam position data via a serial network

  18. 500 MHz narrowband beam position monitor electronics for electron synchrotrons

    Science.gov (United States)

    Mohos, I.; Dietrich, J.

    1998-12-01

    Narrowband beam position monitor electronics were developed in the Forschungszentrum Jülich-IKP for the orbit measurement equipment used at ELSA Bonn. The equipment uses 32 monitor chambers, each with four capacitive button electrodes. The monitor electronics, consisting of an rf signal processing module (BPM-RF) and a data acquisition and control module (BPM-DAQ), sequentially process and measure the monitor signals and deliver calculated horizontal and vertical beam position data via a serial network.

  19. Ultra-High Density Electron Beams for Beam Radiation and Beam Plasma Interaction

    CERN Document Server

    Anderson, Scott; Frigola, Pedro; Gibson, David J; Hartemann, Fred V; Jacob, Jeremy S; Lim, Jae; Musumeci, Pietro; Rosenzweig, James E; Travish, Gil; Tremaine, Aaron M

    2005-01-01

    Current and future applications of high brightness electron beams, which include advanced accelerators such as the plasma wake-field accelerator (PWFA) and beam-radiation interactions such as inverse-Compton scattering (ICS), require both transverse and longitudinal beam sizes on the order of tens of microns. Ultra-high density beams may be produced at moderate energy (50 MeV) by compression and subsequent strong focusing of low emittance, photoinjector sources. We describe the implementation of this method used at LLNL's PLEIADES ICS x-ray source in which the photoinjector-generated beam has been compressed to 300 fsec duration using the velocity bunching technique and focused to 20 μm rms size using an extremely high gradient, permanent magnet quadrupole (PMQ) focusing system.

  20. Measuring the electron beam energy in a magnetic bunch compressor

    Energy Technology Data Exchange (ETDEWEB)

    Hacker, Kirsten

    2010-09-15

    Within this thesis, work was carried out in and around the first bunch compressor chicane of the FLASH (Free-electron LASer in Hamburg) linear accelerator in which two distinct systems were developed for the measurement of an electron beams' position with sub-5 {mu}m precision over a 10 cm range. One of these two systems utilized RF techniques to measure the difference between the arrival-times of two broadband electrical pulses generated by the passage of the electron beam adjacent to a pickup antenna. The other system measured the arrival-times of the pulses from the pickup with an optical technique dependent on the delivery of laser pulses which are synchronized to the RF reference of the machine. The relative advantages and disadvantages of these two techniques are explored and compared to other available approaches to measure the same beam property, including a time-of-flight measurement with two beam arrival-time monitors and a synchrotron light monitor with two photomultiplier tubes. The electron beam position measurement is required as part of a measurement of the electron beam energy and could be used in an intra-bunch-train beam-based feedback system that would stabilize the amplitude of the accelerating field. By stabilizing the accelerating field amplitude, the arrival-time of the electron beam can be made more stable. By stabilizing the electron beam arrival-time relative to a stable reference, diagnostic, seeding, and beam-manipulation lasers can be synchronized to the beam. (orig.)

  1. Measuring the electron beam energy in a magnetic bunch compressor

    International Nuclear Information System (INIS)

    Hacker, Kirsten

    2010-09-01

    Within this thesis, work was carried out in and around the first bunch compressor chicane of the FLASH (Free-electron LASer in Hamburg) linear accelerator in which two distinct systems were developed for the measurement of an electron beams' position with sub-5 μm precision over a 10 cm range. One of these two systems utilized RF techniques to measure the difference between the arrival-times of two broadband electrical pulses generated by the passage of the electron beam adjacent to a pickup antenna. The other system measured the arrival-times of the pulses from the pickup with an optical technique dependent on the delivery of laser pulses which are synchronized to the RF reference of the machine. The relative advantages and disadvantages of these two techniques are explored and compared to other available approaches to measure the same beam property, including a time-of-flight measurement with two beam arrival-time monitors and a synchrotron light monitor with two photomultiplier tubes. The electron beam position measurement is required as part of a measurement of the electron beam energy and could be used in an intra-bunch-train beam-based feedback system that would stabilize the amplitude of the accelerating field. By stabilizing the accelerating field amplitude, the arrival-time of the electron beam can be made more stable. By stabilizing the electron beam arrival-time relative to a stable reference, diagnostic, seeding, and beam-manipulation lasers can be synchronized to the beam. (orig.)

  2. Electron energy distribution from intense electron beams in the upper mesosphere and lower thermosphere

    International Nuclear Information System (INIS)

    Martinez-Sanchez, M.; Cheng, Wai; Dvore, D.; Zahniser, M.S.

    1992-01-01

    A model was developed to calculate the electron energy spectrum created by an electron beam in the upper atmosphere. A significant feature of the model is the inclusion of the effects of electron-electron collisions which are important at high beam intensity when the ratio of the electron to ambient gas density is high. Comparing the calculated results for a 2.6-kV, 20-A beam at 110-km altitude from models with and without the electron-electron collision term, the electron-electron collisions have the effect of smoothing out the electron spectrum in the low-energy region ( 2 and O 2 are filled in, resulting in an increase in the calculated production rate of these species compared with model calculations that neglect this effect

  3. Thermal shock testing of low-Z coatings with pulsed hydrogen beams

    International Nuclear Information System (INIS)

    Nakamura, Kazuyuki

    1982-03-01

    Thermal shock testing of candidate low-Z surface coatings for JT-60 application has been made by using a pulsed hydrogen beam apparatus which is operated at a power density of 2KW/cm 2 . The materials tested are PVD (Physical Vapor Deposited) TiC and PVD and CVD (Chemical Vapor Deposited) TiN on molybdenum and Inconel 625. The result shows that CVD TiC on Mo and CVD TiN on Inconel are the most interesting choices for the coating-substrate combinations. (author)

  4. Simulation of 10 A electron-beam formation and collection for a high current electron-beam ion source

    Science.gov (United States)

    Kponou, A.; Beebe, E.; Pikin, A.; Kuznetsov, G.; Batazova, M.; Tiunov, M.

    1998-02-01

    Presented is a report on the development of an electron-beam ion source (EBIS) for the relativistic heavy ion collider at Brookhaven National Laboratory (BNL) which requires operating with a 10 A electron beam. This is approximately an order of magnitude higher current than in any existing EBIS device. A test stand is presently being designed and constructed where EBIS components will be tested. It will be reported in a separate paper at this conference. The design of the 10 A electron gun, drift tubes, and electron collector requires extensive computer simulations. Calculations have been performed at Novosibirsk and BNL using two different programs, SAM and EGUN. Results of these simulations will be presented.

  5. Electron beam cooling by laser

    CERN Document Server

    Urakawa, J; Terunuma, N; Taniguchi, T; Yamazaki, Y; Hirano, K; Nomura, M; Sakai, I; Takano, M; Sasao, N; Honda, Y; Noda, A; Bulyak, E; Gladkikh, P; Mystykov, A; Zelinsky, A; Zimmermann, Frank

    2004-01-01

    In 1997, Z.Huang and R.Ruth proposed a compact laser-electron storage ring (LESR) for electron beam cooling or x-ray generation. Because the laser-wire monitor in the ATF storage ring has worked well and demonstrated the achievement of the world's smallest transverse emittance for a circulating electron beam, we have started the design of a small storage ring with about 10 m circumference and the development of basic technologies for the LESR. In this paper, we describe the design and experimental results of pulse stacking in a 42-cm long optical cavity. Since our primary purpose is demonstrating the proof-of-principle of the LESR, we will then discuss the future experimental plan at the KEK-ATF for the generation of high average-brilliance gamma-rays.

  6. SLC polarized beam source electron optics design

    International Nuclear Information System (INIS)

    Eppley, K.R.; Lavine, T.L.; Early, R.A.; Herrmannsfeldt, W.B.; Miller, R.H.; Schultz, D.C.; Spencer, C.M.; Yeremian, A.D.

    1991-05-01

    This paper describes the design of the beam-line from the polarized electron gun to the linac injector in the Stanford Linear Collider (SLC). The polarized electron source is a GaAs photocathode, requiring 10 -11 -Torr-range pressure for adequate quantum efficiency and longevity. The photocathode is illuminated by 3-nsec-long laser pulses. The quality of the optics for the 160-kV beam is crucial since electron-stimulated gas desorption from beam loss in excess of 0.1% of the 20-nC pulses may poison the photocathode. Our design for the transport line consists of a differential pumping region isolated by a pair of valves. Focusing is provided by a pair of Helmholtz coils and by several iron-encased solenoidal lenses. Our optics design is based on beam transport simulations using 2 1/2-D particle-in-cell codes to model the gun and to solve the fully-relativistic time-dependent equations of motion in three dimensions for electrons in the presence of azimuthally symmetric electromagnetic fields. 6 refs., 6 figs

  7. Welding by using doubly-deflected rotating electron beam

    International Nuclear Information System (INIS)

    Dabek, J.W.; Friedel, K.

    1997-01-01

    The paper presents the welding process by using double-deflected rotating electron beam, as a method to obtain good quality welds. It is shown possible variants of work of modified beam, principles of creation, process control and results of welding. Comparison of quality welds obtained by using traditional and modified electron beams is made too. (author). 11 refs, 8 figs

  8. Scattered radiation from applicators in clinical electron beams

    International Nuclear Information System (INIS)

    Battum, L J van; Zee, W van der; Huizenga, H

    2003-01-01

    In radiotherapy with high-energy (4-25 MeV) electron beams, scattered radiation from the electron applicator influences the dose distribution in the patient. In most currently available treatment planning systems for radiotherapy this component is not explicitly included and handled only by a slight change of the intensity of the primary beam. The scattered radiation from an applicator changes with the field size and distance from the applicator. The amount of scattered radiation is dependent on the applicator design and on the formation of the electron beam in the treatment head. Electron applicators currently applied in most treatment machines are essentially a set of diaphragms, but still do produce scattered radiation. This paper investigates the present level of scattered dose from electron applicators, and as such provides an extensive set of measured data. The data provided could for instance serve as example input data or benchmark data for advanced treatment planning algorithms which employ a parametrized initial phase space to characterize the clinical electron beam. Central axis depth dose curves of the electron beams have been measured with and without applicators in place, for various applicator sizes and energies, for a Siemens Primus, a Varian 2300 C/D and an Elekta SLi accelerator. Scattered radiation generated by the applicator has been found by subtraction of the central axis depth dose curves, obtained with and without applicator. Scattered radiation from Siemens, Varian and Elekta electron applicators is still significant and cannot be neglected in advanced treatment planning. Scattered radiation at the surface of a water phantom can be as high as 12%. Scattered radiation decreases almost linearly with depth. Scattered radiation from Varian applicators shows clear dependence on beam energy. The Elekta applicators produce less scattered radiation than those of Varian and Siemens, but feature a higher effective angular variance. The scattered

  9. Electron beam processing of combustion flue gases

    International Nuclear Information System (INIS)

    1987-07-01

    This report contains the papers presented at the consultants' meeting on electron beam processing of combustion flue gases. The meeting provided an excellent opportunity for exchanging information and reviewing the current status of technology development. Characteristics of the electron beam processing recognized by the meeting are: capability of simultaneous removals of SO 2 and NO x , safe technology and simplicity of control, dry process without waste water to be treated, cost benefit of electron beam processing compared with conventional technology and the conversion of SO 2 and NO x to a by-product that can be used as agricultural fertilizer. A separate abstract was prepared for each of the 22 papers in this technical report

  10. Tesla-transformer-type electron beam accelerator

    International Nuclear Information System (INIS)

    Liu Jinliang; Zhong Huihuang; Tan Qimei; Li Chuanlu; Zhang Jiande

    2002-01-01

    An electron-beam Tesla-transformer accelerator is described. It consists of the primary storage energy system. Tesla transformer, oil Blumlein pulse form line, and the vacuum diode. The experiments of initial stage showed that diode voltage rises up to about 500 kV with an input of 20 kV and the maximum electron-beam current is about 9 kA, the pulse width is about 50 ns. This device can operate stably and be set up easily

  11. Al2O3 e-Beam Evaporated onto Silicon (100)/SiO2, by XPS

    Energy Technology Data Exchange (ETDEWEB)

    Madaan, Nitesh; Kanyal, Supriya S.; Jensen, David S.; Vail, Michael A.; Dadson, Andrew; Engelhard, Mark H.; Samha, Hussein; Linford, Matthew R.

    2013-09-25

    We report the XPS characterization of a thin film of Al2O3 (35 nm) deposited via e-beam evaporation onto silicon (100). The film was characterized with monochromatic Al Ka radiation. An XPS survey scan, an Al 2p narrow scan, and the valence band spectrum were collected. The Al2O3 thin film is used as a diffusion barrier layer for templated carbon nanotube (CNT) growth in the preparation of microfabricated thin layer chromatography plates.

  12. Production of slow-positron beams with an electron linac

    International Nuclear Information System (INIS)

    Howell, R.H.; Alvarez, R.A.; Stanek, M.

    1982-01-01

    Intense, pulsed beams of low-energy positrons have been produced by a high-energy beam from an electron linac. The production efficiency for low-energy positrons has been determined for electrons with 60 to 120 MeV energy, low-energy positron beams from a linac can be of much higher intensity than those beams currently derived from radioactive sources

  13. Multi-GeV electron-positron beam generation from laser-electron scattering.

    Science.gov (United States)

    Vranic, Marija; Klimo, Ondrej; Korn, Georg; Weber, Stefan

    2018-03-16

    The new generation of laser facilities is expected to deliver short (10 fs-100 fs) laser pulses with 10-100 PW of peak power. This opens an opportunity to study matter at extreme intensities in the laboratory and provides access to new physics. Here we propose to scatter GeV-class electron beams from laser-plasma accelerators with a multi-PW laser at normal incidence. In this configuration, one can both create and accelerate electron-positron pairs. The new particles are generated in the laser focus and gain relativistic momentum in the direction of laser propagation. Short focal length is an advantage, as it allows the particles to be ejected from the focal region with a net energy gain in vacuum. Electron-positron beams obtained in this setup have a low divergence, are quasi-neutral and spatially separated from the initial electron beam. The pairs attain multi-GeV energies which are not limited by the maximum energy of the initial electron beam. We present an analytical model for the expected energy cutoff, supported by 2D and 3D particle-in-cell simulations. The experimental implications, such as the sensitivity to temporal synchronisation and laser duration is assessed to provide guidance for the future experiments.

  14. On the physics of electron beams in space plasmas

    International Nuclear Information System (INIS)

    Krafft, C.; Volokitin, A.

    2002-01-01

    This paper discusses the main physical processes related to the injection, the propagation and the radiation of electron beams in space plasmas as the Earth's ionosphere. The physical mechanisms are shortly explained and illustrated with several examples of experimental results provided by various space missions. In a first part, we discuss important physical processes connected with the response of the ambient space plasma to the beam injection, and in particular, with the mechanisms of electric charge neutralization of the electron beam and of the payload carrying the injector, with the widely studied phenomenon of beam-plasma discharge as well as with the physical features of the spatio-temporal evolution and the dynamic structure of the beam in its interaction with the plasma and the emitted waves. In a second part, the main processes governing the wave emission by electron beams in space are examined; in particular, we focus on the physical linear and nonlinear mechanisms involved in the generation, the stabilization and the saturation of the electromagnetic waves excited by the beams in wide frequency ranges. and the radiation of electron beams in space plasmas as the Earth's ionosphere. The physical mechanisms are shortly explained and illustrated with several examples of experimental results provided by various space missions. In a first part, we discuss important physical processes connected with the response of the ambient space plasma to the beam injection, and in particular, with the mechanisms of electric charge neutralization of the electron beam and of the payload carrying the injector, with the widely studied phenomenon of beam-plasma discharge as well as with the physical features of the spatio-temporal evolution and the dynamic structure of the beam in its interaction with the plasma and the emitted waves. In a second part, the main processes governing the wave emission by electron beams in space are examined; in particular, we focus on the

  15. Longitudinal Diagnostics for Short Electron Beam Bunches

    Energy Technology Data Exchange (ETDEWEB)

    Loos, H.; /SLAC

    2010-06-11

    Single-pass free electron lasers require high peak currents from ultra-short electron bunches to reach saturation and an accurate measurement of bunch length and longitudinal bunch profile is necessary to control the bunch compression process from low to high beam energy. The various state-of-the-art diagnostics methods from ps to fs time scales using coherent radiation detection, RF deflection, and other techniques are presented. The use of linear accelerators as drivers for free electron lasers (FEL) and the advent of single-pass (SASE) FELs has driven the development of a wide range of diagnostic techniques for measuring the length and longitudinal distribution of short and ultra-short electron bunches. For SASE FELs the radiation power and the length of the undulator needed to achieve saturation depend strongly on the charge density of the electron beam. In the case of X-ray FELs, this requires the accelerator to produce ultra-high brightness beams with micron size transverse normalized emittances and peak currents of several kA through several stages of magnetic bunch compression. Different longitudinal diagnostics are employed to measure the peak current and bunch profile along these stages. The measurement techniques can be distinguished into different classes. Coherent methods detect the light emitted from the beam by some coherent radiation process (spectroscopic measurement), or directly measure the Coulomb field traveling with the beam (electro-optic). Phase space manipulation techniques map the time coordinate onto a transverse dimension and then use conventional transverse beam diagnostics (transverse deflector, rf zero-phasing). Further methods measure the profile or duration of an incoherent light pulse emitted by the bunch at wavelengths much shorted than the bunch length (streak camera, fluctuation technique) or modulate the electron beam at an optical wavelength and then generate a narrow bandwidth radiation pulse with the longitudinal profile of

  16. High precision electron beam diagnostic system for high current long pulse beams

    International Nuclear Information System (INIS)

    Chen, Y J; Fessenden, T; Holmes, C; Nelson, S D; Selchow, N.

    1999-01-01

    As part of the effort to develop a multi-axis electron beam transport system using stripline kicker technology for DARHT II applications, it is necessary to precisely determine the position and extent of long high energy beams (6-40 MeV, 1-4 kA, 2 microseconds) for accurate position control. The kicker positioning system utilizes shot-to-shot adjustments for reduction of relatively slow (<20 MHz) motion of the beam centroid. The electron beams passing through the diagnostic systems have the potential for large halo effects that tend to corrupt measurements performed using capacitive pick-off probes. Likewise, transmission line traveling wave probes have problems with multi-bounce effects due to these longer pulse widths. Finally, the high energy densities experienced in these applications distort typical foil beam position measurements

  17. High-energy electron beams for ceramic joining

    Science.gov (United States)

    Turman, Bob N.; Glass, S. J.; Halbleib, J. A.; Helmich, D. R.; Loehman, Ron E.; Clifford, Jerome R.

    1995-03-01

    Joining of structural ceramics is possible using high melting point metals such as Mo and Pt that are heated with a high energy electron beam, with the potential for high temperature joining. A 10 MeV electron beam can penetrate through 1 cm of ceramic, offering the possibility of buried interface joining. Because of transient heating and the lower heat capacity of the metal relative to the ceramic, a pulsed high power beam has the potential for melting the metal without decomposing or melting the ceramic. We have demonstrated the feasibility of the process with a series of 10 MeV, 1 kW electron beam experiments. Shear strengths up to 28 MPa have been measured. This strength is comparable to that reported in the literature for bonding silicon nitride (Si3N4) to molybdenum with copper-silver-titanium braze, but weaker than that reported for Si3N4 - Si3N4 with gold-nickel braze. The bonding mechanism appears to be formation of a thin silicide layer. Beam damage to the Si3N4 was also assessed.

  18. Quantitative Analysis of Electron Beam Damage in Organic Thin Films

    OpenAIRE

    Leijten, Zino J. W. A.; Keizer, Arthur D. A.; de With, Gijsbertus; Friedrich, Heiner

    2017-01-01

    In transmission electron microscopy (TEM) the interaction of an electron beam with polymers such as P3HT:PCBM photovoltaic nanocomposites results in electron beam damage, which is the most important factor limiting acquisition of structural or chemical data at high spatial resolution. Beam effects can vary depending on parameters such as electron dose rate, temperature during imaging, and the presence of water and oxygen in the sample. Furthermore, beam damage will occur at different length s...

  19. Electron Beam Alignment Strategy in the LCLS Undulators

    International Nuclear Information System (INIS)

    Nuhn, H

    2007-01-01

    The x-ray FEL process puts very tight tolerances on the straightness of the electron beam trajectory (2 (micro)m rms) through the LCLS undulator system. Tight but less stringent tolerances of 80 (micro)m rms vertical and 140 (micro)m rms horizontally are to be met for the placement of the individual undulator segments with respect to the beam axis. The tolerances for electron beam straightness can only be met through beam-based alignment (BBA) based on electron energy variations. Conventional alignment will set the start conditions for BBA. Precision-fiducialization of components mounted on remotely adjustable girders and the use of beam-finder wires (BFW) will satisfy placement tolerances. Girder movement due to ground motion and temperature changes will be monitored continuously by an alignment monitoring system (ADS) and remotely corrected. This stabilization of components as well as the monitoring and correction of the electron beam trajectory based on BPMs and correctors will increase the time between BBA applications. Undulator segments will be periodically removed from the undulator Hall and measured to monitor radiation damage and other effects that might degrade undulator tuning

  20. Development of environmentally compatible tribosystems with PVD-technology

    International Nuclear Information System (INIS)

    Lugscheider, E.; Hornig, T.; Kienitz, S.; Klocke, F.; Krieg, T.

    2001-01-01

    PVD coatings offer a wide variety of applications. The focal point of this work is the development of an advanced type of PVD-hardcoating which allows machining with environmentally compatible lubricants. Representative examples for the investigations are the tribological systems 'turning of quenched and tempered steel 42CrMo4 V' and 'austenitic stainless steel X5CrNi18-10'. Ti-Hf-Cr-N and TiAlN/Al 2 O 3 were deposited by AIP- and H.I.S. TM - process respectively. These coating systems showed best results concerning oxidation wear and abrasive wear in former investigations. This was necessary because main cutting-edge life criterias are oxidation wear and abrasive wear at the minor cutting edge. Consequently, a high oxidation stability and a high hardness at high temperatures are required. (author)

  1. Electron beam solenoid reactor concept

    International Nuclear Information System (INIS)

    Bailey, V.; Benford, J.; Cooper, R.; Dakin, D.; Ecker, B.; Lopez, O.; Putman, S.; Young, T.S.T.

    1977-01-01

    The electron Beam Heated Solenoid (EBHS) reactor is a linear magnetically confined fusion device in which the bulk or all of the heating is provided by a relativistic electron beam (REB). The high efficiency and established technology of the REB generator and the ability to vary the coupling length make this heating technique compatible with several radial and axial enery loss reduction options including multiple-mirrors, electrostatic and gas end-plug techniques. This paper addresses several of the fundamental technical issues and provides a current evaluation of the concept. The enhanced confinement of the high energy plasma ions due to nonadiabatic scattering in the multiple mirror geometry indicates the possibility of reactors of the 150 to 300 meter length operating at temperatures > 10 keV. A 275 meter EBHS reactor with a plasma Q of 11.3 requiring 33 MJ of beam eneergy is presented

  2. New evaporator station for the center for accelerator target science

    Science.gov (United States)

    Greene, John P.; Labib, Mina

    2018-05-01

    As part of an equipment grant provided by DOE-NP for the Center for Accelerator Target Science (CATS) initiative, the procurement of a new, electron beam, high-vacuum deposition system was identified as a priority to insure reliable and continued availability of high-purity targets. The apparatus is designed to contain TWO electron beam guns; a standard 4-pocket 270° geometry source as well as an electron bombardment source. The acquisition of this new system allows for the replacement of TWO outdated and aging vacuum evaporators. Also included is an additional thermal boat source, enhancing our capability within this deposition unit. Recommended specifications for this system included an automated, high-vacuum pumping station, a deposition chamber with a rotating and heated substrate holder for uniform coating capabilities and incorporating computer-controlled state-of-the-art thin film technologies. Design specifications, enhanced capabilities and the necessary mechanical modifications for our target work are discussed.

  3. Brookhaven National Laboratory electron beam test stand

    International Nuclear Information System (INIS)

    Pikin, A.; Alessi, J.; Beebe, E.; Kponou, A.; Prelec, K.; Snydstrup, L.

    1998-01-01

    The main purpose of the electron beam test stand (EBTS) project at the Brookhaven National Laboratory is to build a versatile device to develop technologies that are relevant for a high intensity electron beam ion source (EBIS) and to study the physics of ion confinement in a trap. The EBTS will have all the main attributes of EBIS: a 1-m-long, 5 T superconducting solenoid, electron gun, drift tube structure, electron collector, vacuum system, ion injection system, appropriate control, and instrumentation. Therefore it can be considered a short prototype of an EBIS for a relativistic heavy ion collider. The drift tube structure will be mounted in a vacuum tube inside a open-quotes warmclose quotes bore of a superconducting solenoid, it will be at room temperature, and its design will employ ultrahigh vacuum technology to reach the 10 -10 Torr level. The first gun to be tested will be a 10 A electron gun with high emission density and magnetic compression of the electron beam. copyright 1998 American Institute of Physics

  4. Microtexture of the thermally grown alumina in commercial thermal barrier coatings

    Energy Technology Data Exchange (ETDEWEB)

    Karadge, M. [School of Materials, University of Manchester, Grosvenor St., Manchester M1 7HS (United Kingdom); Zhao, X. [School of Materials, University of Manchester, Grosvenor St., Manchester M1 7HS (United Kingdom); Preuss, M. [School of Materials, University of Manchester, Grosvenor St., Manchester M1 7HS (United Kingdom); Xiao, P. [School of Materials, University of Manchester, Grosvenor St., Manchester M1 7HS (United Kingdom)]. E-mail: Ping.Xiao@manchester.ac.uk

    2006-02-15

    otextures of the thermally grown {alpha}-alumina (TGO) in isothermally treated and thermal cycled electron beam physical vapor deposited thermal barrier coatings (EB-PVD-TBC) and isothermally treated air plasma sprayed (APS-TBC) specimens were studied by high resolution electron back-scattered diffraction. The TGO in EB-PVD specimens exhibited a basal microtexture. The TGO in APS specimens, however, did not show any significant microtexture development.

  5. Plasma heating by a relativistic electron beam

    International Nuclear Information System (INIS)

    Janssen, G.C.A.M.

    1983-01-01

    This thesis is devoted to the interaction of a Relativistic Electron Beam (REB) with a plasma. The goal of the experiment described herein is to study in detail the mechanism of energy transfer from the beam to the plasma. The beam particles have an energy of 800 keV, a current of 6 kA, a diameter of 3 cm and an adjustable pulse length of 50-150 ns. This beam is injected into cold hydrogen and helium plasmas with densities ranging from 10 18 to 10 20 m -3 . First, the technical aspects of the experiment are described. Then measurements on the hf fields excited by the REB-plasma are presented (optical line profiles and spectra of beam electrons). The final section is devoted to plasma heating. (Auth.)

  6. EB-PVD process management for highly productive zirconia thermal barrier coating of turbine blades

    International Nuclear Information System (INIS)

    Reinhold, E.; Botzler, P.; Deus, C.

    1999-01-01

    Zirconia thermal barrier coatings are well used in the turbine manufacturing industry because they ensure extended lifetimes of turbine blades. Compared with other techniques, EB-PVD processes are best suited for the deposition on turbine blades with regard to the layer properties. Therefore EB-PVD coaters for turbine blades are becoming increasingly interesting. The coating costs per component are mainly dependent on a highly productive solution for the deposition task. Thus the EB-PVD process management has to be optimized in order to meet the productivity requirements of the manufacturers. This includes the requirement of high deposition rates, large deposition areas, long time stable production cycles as well as a matched duration of preheating, deposition and cooling down per charge. Modern EB-PVD solutions to be introduced allow deposition rates on blades up to 7 μm/min. The consequences for the technological process management and plant design concerning long time stable coating cycles with high productivity will be discussed. (orig.)

  7. Development of electron beam deflection circuit

    International Nuclear Information System (INIS)

    Leo Kwee Wah; Lojius Lombigit; Abu Bakar Ghazali; Azaman

    2007-01-01

    This paper describes a development of a power supply circuit to deflect and move the electron beam across the window of the Baby electron beam machine. It comprises a discussion of circuit design, its assembly and the test results. A variety of input and output conditions have been tested and it was found that the design is capable to supply 1.0 A with 50Hz on X-axis coil and 0.4A with 500Hz on Y-axis coil. (Author)

  8. WE-A-207-02: Electron Beam Therapy - Current Status and Future Directions

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Q. [Duke University Medical Center (United States)

    2015-06-15

    In memory of the significant contribution of Dr. Jacques Ovadia to electron beam techniques, this session will review recent, advanced techniques which are reinvigorating the science of electron beam radiation therapy. Recent research efforts in improving both the applicability and quality of the electron beam therapy will be discussed, including modulated electron beam radiotherapy (MERT) and dynamic electron arc radiotherapy (DEAR). Learning Objectives: To learn about recent advances in electron beam therapy, including modulated electron beam therapy and dynamic electron arc therapy (DEAR). Put recent advances in the context of work that Dr. Ovadia pursued during his career in medical physics.

  9. WE-A-207-02: Electron Beam Therapy - Current Status and Future Directions

    International Nuclear Information System (INIS)

    Wu, Q.

    2015-01-01

    In memory of the significant contribution of Dr. Jacques Ovadia to electron beam techniques, this session will review recent, advanced techniques which are reinvigorating the science of electron beam radiation therapy. Recent research efforts in improving both the applicability and quality of the electron beam therapy will be discussed, including modulated electron beam radiotherapy (MERT) and dynamic electron arc radiotherapy (DEAR). Learning Objectives: To learn about recent advances in electron beam therapy, including modulated electron beam therapy and dynamic electron arc therapy (DEAR). Put recent advances in the context of work that Dr. Ovadia pursued during his career in medical physics

  10. Method for controlling low-energy high current density electron beams

    International Nuclear Information System (INIS)

    Lee, J.N.; Oswald, R.B. Jr.

    1977-01-01

    A method and an apparatus for controlling the angle of incidence of low-energy, high current density electron beams are disclosed. The apparatus includes a current generating diode arrangement with a mesh anode for producing a drifting electron beam. An auxiliary grounded screen electrode is placed between the anode and a target for controlling the average angle of incidence of electrons in the drifting electron beam. According to the method of the present invention, movement of the auxiliary screen electrode relative to the target and the anode permits reliable and reproducible adjustment of the average angle of incidence of the electrons in low energy, high current density relativistic electron beams

  11. The limits of application of variable-energy slow positron beams for investigating TiN hard coatings prepared by PVD

    International Nuclear Information System (INIS)

    Marek, T.; Suevegh, K.; Vertes, A.; Szeles, Cs.; Lynn, K.G.

    2000-01-01

    Samples of TiN hard coatings prepared by physical vapour deposition (PVD) were investigated by means of depth-sensitive positron annihilation spectroscopy. The results indicate that the samples are at the limits of the applicability of this method presumably due to the high defect concentration. Though the samples are thoroughly characterized by other independent methods, they might not be sufficient to explain all aspects of positron-solid interactions in these cases. (author)

  12. Suppression of electron waves in relation to the deformation of the electron beam distribution function

    International Nuclear Information System (INIS)

    Fukumasa, O.; Itatani, R.

    1978-01-01

    The change of the electron beam distribution function due to the wave excited by the beam density modulation is observed, in relation to the suppression of electron waves in a beam-plasma system. (Auth.)

  13. Drag of ballistic electrons by an ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Gurevich, V. L.; Muradov, M. I., E-mail: mag.muradov@mail.ioffe.ru [Russian Academy of Sciences, Ioffe Physicotechnical Institute (Russian Federation)

    2015-12-15

    Drag of electrons of a one-dimensional ballistic nanowire by a nearby one-dimensional beam of ions is considered. We assume that the ion beam is represented by an ensemble of heavy ions of the same velocity V. The ratio of the drag current to the primary current carried by the ion beam is calculated. The drag current turns out to be a nonmonotonic function of velocity V. It has a sharp maximum for V near v{sub nF}/2, where n is the number of the uppermost electron miniband (channel) taking part in conduction and v{sub nF} is the corresponding Fermi velocity. This means that the phenomenon of ion beam drag can be used for investigation of the electron spectra of ballistic nanostructures. We note that whereas observation of the Coulomb drag between two parallel quantum wires may in general be complicated by phenomena such as tunneling and phonon drag, the Coulomb drag of electrons of a one-dimensional ballistic nanowire by an ion beam is free of such spurious effects.

  14. Time-dependent field equations for paraxial relativistic electron beams: Beam Research Program

    International Nuclear Information System (INIS)

    Sharp, W.M.; Yu, S.S.; Lee, E.P.

    1987-01-01

    A simplified set of field equations for a paraxial relativistic electron beam is presented. These equations for the beam electrostatic potential phi and pinch potential Phi identical to A/sub z/ - phi retain previously neglected time-dependent terms and for axisymmetric beams reduce exactly to Maxwell's equations

  15. Study of electron beam production by a plasma focus

    International Nuclear Information System (INIS)

    Smith, J.R.; Luo, C.M.; Rhee, M.J.; Schneider, R.F.

    1983-01-01

    A preliminary investigation of the electron beam produced by a plasma focus device using a current charged transmission line is described. Electron beam currents as high as 10 kA were measured. Interaction of the extracted beam and the filling gas was studied using open shutter photography

  16. Simulation of 10 A electron-beam formation and collection for a high current electron-beam ion source

    International Nuclear Information System (INIS)

    Kponou, A.; Beebe, E.; Pikin, A.; Kuznetsov, G.; Batazova, M.; Tiunov, M.

    1998-01-01

    Presented is a report on the development of an electron-beam ion source (EBIS) for the relativistic heavy ion collider at Brookhaven National Laboratory (BNL) which requires operating with a 10 A electron beam. This is approximately an order of magnitude higher current than in any existing EBIS device. A test stand is presently being designed and constructed where EBIS components will be tested. It will be reported in a separate paper at this conference. The design of the 10 A electron gun, drift tubes, and electron collector requires extensive computer simulations. Calculations have been performed at Novosibirsk and BNL using two different programs, SAM and EGUN. Results of these simulations will be presented. copyright 1998 American Institute of Physics

  17. A simultaneous electron energy and dosimeter calibration method for an electron beam irradiator

    International Nuclear Information System (INIS)

    Tanaka, R.; Sunaga, H.; Kojima, T.

    1991-01-01

    In radiation processing using electron accelerators, the reproducibility of absorbed dose in the product depends not only on the variation of beam current and conveyor speed, but also on variations of other accelerator parameters. This requires routine monitoring of the beam current and the scan width, and also requires periodical calibration of routine dosimeters usually in the shape of film, electron energy, and other radiation field parameters. The electron energy calibration is important especially for food processing. The dose calibration method using partial absorption calorimeters provides only information about absorbed dose. Measurement of average electron current density provides basic information about the radiation field formed by the beam scanning and scattering at the beam window, though it does not allow direct dose calibration. The total absorption calorimeter with a thick absorber allows dose and dosimeter calibration, if the depth profile of relative dose in a reference absorber is given experimentally. It also allows accurate calibration of the average electron energy at the surface of the calorimeter core, if electron fluence received by the calorimeter is measured at the same time. This means that both electron energy and dosimeters can be simultaneously calibrated by irradiation of a combined system including the calorimeter, the detector of the electron current density meter, and a thick reference absorber for depth profile measurement of relative dose. We have developed a simple and multifunctional system using the combined calibration method for 5 MeV electron beams. The paper describes a simultaneous calibration method for electron energy and film dosimeters, and describes the electron current density meter, the total absorption calorimeter, and the characteristics of this method. (author). 13 refs, 7 figs, 3 tabs

  18. A device for measuring electron beam characteristics

    Directory of Open Access Journals (Sweden)

    M. Andreev

    2017-01-01

    Full Text Available This paper presents a device intended for diagnostics of electron beams and the results obtained with this device. The device comprises a rotating double probe operating in conjunction with an automated probe signal collection and processing system. This provides for measuring and estimating the electron beam characteristics such as radius, current density, power density, convergence angle, and brightness.

  19. Ion beam processing of advanced electronic materials

    International Nuclear Information System (INIS)

    Cheung, N.W.; Marwick, A.D.; Roberto, J.B.

    1989-01-01

    This report contains research programs discussed at the materials research society symposia on ion beam processing of advanced electronic materials. Major topics include: shallow implantation and solid-phase epitaxy; damage effects; focused ion beams; MeV implantation; high-dose implantation; implantation in III-V materials and multilayers; and implantation in electronic materials. Individual projects are processed separately for the data bases

  20. High quality electron beams from a laser wakefield accelerator

    Energy Technology Data Exchange (ETDEWEB)

    Wiggins, S M; Issac, R C; Welsh, G H; Brunetti, E; Shanks, R P; Anania, M P; Cipiccia, S; Manahan, G G; Aniculaesei, C; Ersfeld, B; Islam, M R; Burgess, R T L; Vieux, G; Jaroszynski, D A [SUPA, Department of Physics, University of Strathclyde, Glasgow (United Kingdom); Gillespie, W A [SUPA, Division of Electronic Engineering and Physics, University of Dundee, Dundee (United Kingdom); MacLeod, A M [School of Computing and Creative Technologies, University of Abertay Dundee, Dundee (United Kingdom); Van der Geer, S B; De Loos, M J, E-mail: m.wiggins@phys.strath.ac.u [Pulsar Physics, Burghstraat 47, 5614 BC Eindhoven (Netherlands)

    2010-12-15

    High quality electron beams have been produced in a laser-plasma accelerator driven by femtosecond laser pulses with a peak power of 26 TW. Electrons are produced with an energy up to 150 MeV from the 2 mm gas jet accelerator and the measured rms relative energy spread is less than 1%. Shot-to-shot stability in the central energy is 3%. Pepper-pot measurements have shown that the normalized transverse emittance is {approx}1{pi} mm mrad while the beam charge is in the range 2-10 pC. The generation of high quality electron beams is understood from simulations accounting for beam loading of the wakefield accelerating structure. Experiments and self-consistent simulations indicate that the beam peak current is several kiloamperes. Efficient transportation of the beam through an undulator is simulated and progress is being made towards the realization of a compact, high peak brilliance free-electron laser operating in the vacuum ultraviolet and soft x-ray wavelength ranges.