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Sample records for deposited ito films

  1. Highly transparent conductive ITO/Ag/ITO trilayer films deposited by RF sputtering at room temperature

    Directory of Open Access Journals (Sweden)

    Ningyu Ren

    2017-05-01

    Full Text Available ITO/Ag/ITO (IAI trilayer films were deposited on glass substrate by radio frequency magnetron sputtering at room temperature. A high optical transmittance over 94.25% at the wavelength of 550 nm and an average transmittance over the visual region of 88.04% were achieved. The calculated value of figure of merit (FOM reaches 80.9 10-3 Ω-1 for IAI films with 15-nm-thick Ag interlayer. From the morphology and structural characterization, IAI films could show an excellent correlated electric and optical performance if Ag grains interconnect with each other on the bottom ITO layer. These results indicate that IAI trilayer films, which also exhibit low surface roughness, will be well used in optoelectronic devices.

  2. The Effect of Deposition Rate on Electrical, Optical and Structural Properties of ITO Thin Films

    Directory of Open Access Journals (Sweden)

    P. S. Raghupathi

    2005-01-01

    Full Text Available Indium tin oxide (ITO thin films have been prepared using the reactive evaporation technique on glass substrates in an oxygen atmosphere. It is found that the deposition rate plays prominent role in controlling the electrical and optical properties of the ITO thin films. Resistivity, electrical conductivity, activation energy, optical transmission and band gap energy were investigated. A transmittance value of more than 90% in the visible region of the spectrum and an electrical conductivity of 3x10–6 Ωm has been obtained with a deposition rate of 2 nm/min. XRD studies showed that the films are polycrystalline.

  3. Deposition and characterization of ITO films produced by laser ablation at 355 nm

    DEFF Research Database (Denmark)

    Holmelund, E.; Thestrup Nielsen, Birgitte; Schou, Jørgen;

    2002-01-01

    Indium tin oxide (ITO) films have been deposited by pulsed laser deposition (PLD) at 355 nm. Even though the absorption of laser light at the wavelength 355 nm is much smaller than that of the standard excimer lasers for PLD at 248 nm and 193 nm, high-quality films can be produced. At high fluenc...... light, about 0.9, is also comparable to values for films deposited by excimer lasers. The crystalline structure of films produced at 355 nm is similar to that of samples produced by these lasers....

  4. Photoelectric properties of ITO thin films deposited by DC magnetron sputtering*

    Institute of Scientific and Technical Information of China (English)

    Liu Wei; Cheng Shuying

    2011-01-01

    As anti-reflecting thin films and transparent electrodes of solar cells, indium tin oxide (ITO) thin films were prepared on glass substrates by DC magnetron sputtering process. The main sputtering conditions were sputtering power, substrate temperature and work pressure. The influence of the above sputtering conditions on the transmittance and conductivity of the deposited ITO films was investigated. The experimental results show that,the transmittance and the resistivity decrease as the sputtering power increases from 30 to 90 W. When the substrate temperature increases from 25 to 150 ℃, the transmittance increases slightly whereas the resistivity decreases. As the work pressure increases from 0.4 to 2.0 Pa, the transmittance decreases and the resistivity increases. When the sputtering power, substrate temperature and work pressure are 30 W, 150 ℃, 0.4 Pa respectively, the ITO thin films exhibit good electrical and optical properties, with resistivity below 10-4 Ω.cm and the transmittance in the visible wave band beyond 80%. Therefore, the ITO thin films are suitable as transparent electrodes of solar cells.

  5. Transparent Conductive ITO/Ag/ITO Electrode Deposited at Room Temperature for Organic Solar Cells

    Science.gov (United States)

    Kim, Jun Ho; Kang, Tae-Woon; Kwon, Sung-Nam; Na, Seok-In; Yoo, Young-Zo; Im, Hyeong-Seop; Seong, Tae-Yeon

    2016-09-01

    We investigated the optical and electrical properties of room-temperature-deposited indium-tin-oxide (ITO)/Ag (19 nm)/ITO multilayer films as a function of ITO layer thickness. The optical and electrical properties of the ITO/Ag/ITO films were compared with those of high-temperature-deposited ITO-only films for use as an anode in organic solar cells (OSCs). The ITO/Ag/ITO multilayer films had sheet resistances in the range 5.40-5.78 Ω/sq, while the ITO-only film showed 14.18 Ω/sq. The carrier concentration of the ITO/Ag/ITO films gradually decreased from 2.01 × 1022 to 7.20 × 1021 cm-3 as the ITO thickness increased from 17 nm to 83 nm. At 530 nm, the transmittance of the ITO/Ag/ITO (50 nm/19 nm/50 nm) films was ~90%, while that of the ITO-only film gave 96.5%. The multilayer film had a smooth surface with a root mean square (RMS) roughness of 0.49 nm. Poly (3-hexylthiophene) (P3HT):[6,6]-phenyl-C61 butyric acid methylester (PCBM) bulk heterojunction (BHJ)-based OSCs fabricated with the ITO/Ag/ITO (50 nm/19 nm/50 nm) film showed a power conversion efficiency (PCE) (2.84%) comparable to that of OSCs with a conventional ITO-only anode (3.48%).

  6. Transparent Conductive ITO/Ag/ITO Electrode Deposited at Room Temperature for Organic Solar Cells

    Science.gov (United States)

    Kim, Jun Ho; Kang, Tae-Woon; Kwon, Sung-Nam; Na, Seok-In; Yoo, Young-Zo; Im, Hyeong-Seop; Seong, Tae-Yeon

    2017-01-01

    We investigated the optical and electrical properties of room-temperature-deposited indium-tin-oxide (ITO)/Ag (19 nm)/ITO multilayer films as a function of ITO layer thickness. The optical and electrical properties of the ITO/Ag/ITO films were compared with those of high-temperature-deposited ITO-only films for use as an anode in organic solar cells (OSCs). The ITO/Ag/ITO multilayer films had sheet resistances in the range 5.40-5.78 Ω/sq, while the ITO-only film showed 14.18 Ω/sq. The carrier concentration of the ITO/Ag/ITO films gradually decreased from 2.01 × 1022 to 7.20 × 1021 cm-3 as the ITO thickness increased from 17 nm to 83 nm. At 530 nm, the transmittance of the ITO/Ag/ITO (50 nm/19 nm/50 nm) films was 90%, while that of the ITO-only film gave 96.5%. The multilayer film had a smooth surface with a root mean square (RMS) roughness of 0.49 nm. Poly (3-hexylthiophene) (P3HT):[6,6]-phenyl-C61 butyric acid methylester (PCBM) bulk heterojunction (BHJ)-based OSCs fabricated with the ITO/Ag/ITO (50 nm/19 nm/50 nm) film showed a power conversion efficiency (PCE) (2.84%) comparable to that of OSCs with a conventional ITO-only anode (3.48%).

  7. Electrochromic properties of NiOx:H films deposited by DC magnetron sputtering for ITO/NiOx:H/ZrO2/WO3/ITO device

    Science.gov (United States)

    Dong, Dongmei; Wang, Wenwen; Dong, Guobo; Zhou, Yuliang; Wu, Zhonghou; Wang, Mei; Liu, Famin; Diao, Xungang

    2015-12-01

    NiOx:H thin films were deposited on ITO-coated glass by DC reactive magnetron sputtering at room temperature. The effects of the hydrogen content on the structure, morphologies, electrochemical properties, the stoichiometry and chemical states of NiOx:H thin films were systematically studied. In X-ray diffraction and atomic force microscopy analysis, the crystallinity of the films tends to be weakened when the flow amount ratio of Ar:O2:H2 equals 19:1:3 and as confirmed in electrochemical analysis, such relatively weak crystallinity is the main contributing factor to ion transportation. X-ray photoelectron spectroscopy reveals that the increase of the hydrogen contents results in a relatively lower binding energy exhibited in the Ni 2p spectra. The proportion of Ni2O3 in NiOx:H films increases from 22% at bleached state to 33% at colored state. A monolithic all-thin-film inorganic electrochromic device was fabricated with complementary configuration as ITO/NiOx:H/ZrO2/WO3/ITO. The electrochromic device with optimized NiOx:H thin films acting both as ion storage layer and proton-providing source displays high modulation efficiency of 68% at a fixed wavelength 550 nm.

  8. Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that all lTO films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of lTO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23x 10-4 Ω.cm and average transmittance of ~78% at wavelength of 400~700 nm have been achieved for thefilms on polyester at room temperature.

  9. Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    WANG Hua-Lin; DING Wan-Yu; LIU Chao-Qian; CHAI Wei-Ping

    2010-01-01

    @@ Indium tin oxide(ITO)films were deposited on glass substrates at room temperature by dc pulse magnetron sputtering.Varying O2 flux,ITO films with different properties are obtained.Both x-ray diffractometer and x-ray photoelectron spectrometer are used to study the change of crystalline structures and bonding structures of ITO films,respectively.Electrical properties are measured by four-point probe measurements.The results indicate that the chemical structures and compositions of ITO films strongly depend on the O2 flux.With increasing O2flux,ITO films display better crystallization,which could decrease the resistivity of films.On the contrary,ITO films contain less O vacancies with increasing O2 flux,which could worsen the conductive properties of films.Without any heat treatment onto the samples,the resistivity of the ITO film could reach 6.0 × 10-4Ω·cm,with the optimai deposition parameter of 0.2 sccm O2 flux.

  10. Polycrystalline ZnS(x)Se(1 - x) thin films deposited on ITO glass by MBE.

    Science.gov (United States)

    Shen, Da-Ke; Sou, I K; Han, Gao-Rong; Du, Pi-Yi; Que, Duan-Lin

    2003-01-01

    MBE growth of ZnS(x)Se(1 - x) thin films on ITO coated glass substrates were carried out using ZnS and Se sources with the substrate temperature ranging from 270 degrees C to 330 degrees C . The XRD theta/2theta spectra resulted from these films indicated that the as-grown polycrystalline ZnS(x)Se(1 - x) thin films had a preferred orientation along the (111) planes. The evaluated crystal sizes as deduced from the FWHM of the XRD layer peaks showed strong growth temperature dependence, with the optimized temperature being about 290 degrees C. Both AFM and TEM measurements of these thin films also indicated a similar growth temperature dependence. High quality ZnS(x)Se(1 - x) thin film grown at the optimized temperature had the smoothest surface with lowest RMS value of 1.2 nm and TEM cross-sectional micrograph showing a well defined columnar structure.

  11. Polycrystalline ZnSxSe1-x thin films deposited on ITO glass by MBE

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    MBE growth of ZnSxSe1-x thin films on ITO coated glass substrates were carried out using ZnS and Se sources with the substrate temperature ranging from 270℃ to 330℃. The XRD θ/2θ spectra resulted from these films indicated that the as-grown polycrystalline ZnSxSe1-x thin films had a preferred orientation along the (111) planes. The evaluated crystal sizes as deduced from the FWHM of the XRD layer peaks showed strong growth temperature dependence, with the optimized temperature being about 290℃. Both AFM and TEM measurements of these thin films also indicated a similar growth temperature dependence. High quality ZnSxSe1-x thin film grown at the optimized temperature had the smoothest surface with lowest RMS value of 1.2 nm and TEM cross-sectional micrograph showing a well defined columnar structure.

  12. Microstructure and optical properties of nano Ag-ITO films

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    Nano Ag-ITO films with Ag volume fraction of 0.3%-1.0% were prepared by radio-frequency magnetron co-sputtering and analyzed by X-ray diffraction,scanning electron microscopy and ultraviolet-visible spectroscopy.Microstructure analysis shows that the films are composed of polycrystalline ITO matrix embedded with Ag nanoparticles with a mean size of 60-100 nm.Transmissivity spectra of Ag-ITO films indicate that the visible light transmissivity of the films decreases with increasing the Ag fraction.The transmissivity of the annealed films is higher than that of the as-deposited films.The volume 0.3% Ag-ITO films have the highest light reflectance.The annealed films exhibit lower light absorptance than as-deposited films.A surface plasmon resonance(SPR) peak of volume 0.3% Ag-ITO films is located around 510 nm.Compared with the annealed ITO film,the annealed volume 0.3% Ag-ITO film shows 10% higher reflectivity,while its transmittance is almost the same as that of the annealed ITO film,indicating its potential application in new-type transflective displays.

  13. Thickness Dependence of Resistivity and Optical Reflectance of ITO Films

    Institute of Scientific and Technical Information of China (English)

    GAO Mei-Zhen; JOB R; XUE De-Sheng; FAHRNER W R

    2008-01-01

    @@ Indium-tin-oxide (ITO) films deposited on crystalline silicon wafer and Coming glass are prepared by directcurrent magnetron sputtering method at room temperature with various thicknesses. The thickness dependences of structure, resistance and optical reflectance of ITO films are characterized. The results show that when the film thickness is less than 4Ohm, the resistivity and optical reflectance of the ITO tilm changes remarkably with thickness. The optoelectrical properties trend to stabilize when the thickness is over 55 nm. The GXRD result implies that the ITO film begins to crystallize if only the thickness is large enough.

  14. CuS p- type thin film characterization deposited on Ti, ITO and glass substrates using spray pyrolysis deposition (SPD) for light emitting diode (LED) application

    Science.gov (United States)

    Sabah, Fayroz A.; Ahmed, Naser M.; Hassan, Z.; Rasheed, Hiba S.; Azzez, Shrook A.; Al-Hazim, Nabeel Z.

    2016-07-01

    The copper sulphide (CuS) thin films were grown with good adhesion by spray pyrolysis deposition (SPD) on Ti, ITO and glass substrates at 200 °C. The distance between nozzle and substrate is 30 cm. The composition was prepared by mixing copper chloride CuCl2.2H2O as a source of Cu2+ and sodium thiosulfate Na2S2O3.5H2O as a source of and S2-. Two concentrations (0.2 and 0.4 M) were used for each CuCl2 and Na2S2O3 to be prepared and then sprayed (20 ml). The process was started by spraying the solution for 3 seconds and after 10 seconds the cycle was repeated until the solution was sprayed completely on the hot substrates. The structural characteristics were studied using X-ray diffraction; they showed covellite CuS hexagonal crystal structure for 0.2 M concentration, and covellite CuS hexagonal crystal structure with two small peaks of chalcocite Cu2S hexagonal crystal structure for 0.4 M concentration. Also the surface and electrical characteristics were investigated using Field Emission Scanning Electron Microscopy (FESEM) and current source device, respectively. The surface study for the CuS thin films showed nanorods to be established for 0.2 M concentration and mix of nanorods and nanoplates for 0.4 M concentration. The electrical study showed ohmic behavior and low resistivity for these films. Hall Effect was measured for these thin films, it showed that all samples of CuS are p- type thin films and ensured that the resistivity for thin films of 0.2 M concentration was lower than that of 0.4 M concentration; and for the two concentrations CuS thin film deposited on ITO had the lowest resistivity. This leads to the result that the conductivity was high for CuS thin film deposited on ITO substrate, and the conductivity of the three thin films of 0.2 M concentration was higher than that of 0.4 M concentration.

  15. CuS p-type thin film characterization deposited on Ti, ITO and glass substrates using spray pyrolysis deposition (SPD) for light emitting diode (LED) application

    Energy Technology Data Exchange (ETDEWEB)

    Sabah, Fayroz A., E-mail: fayroz-arif@yahoo.com [Institue of Nano-Optoelectronics Research and Technology (INOR), School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Department of Electrical Engineering, College of Engineering, Al-Mustansiriya University, Baghdad (Iraq); Ahmed, Naser M., E-mail: naser@usm.my; Hassan, Z., E-mail: zai@usm.my; Azzez, Shrook A. [Institue of Nano-Optoelectronics Research and Technology (INOR), School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Rasheed, Hiba S., E-mail: hibasaad1980@yahoo.com [Institue of Nano-Optoelectronics Research and Technology (INOR), School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Department of Physics, College of Education, Al-Mustansiriya University, Baghdad (Iraq); Al-Hazim, Nabeel Z., E-mail: nabeelnano333@gmail.com [Institue of Nano-Optoelectronics Research and Technology (INOR), School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Ministry of Education, the General Directorate for Educational Anbar (Iraq)

    2016-07-06

    The copper sulphide (CuS) thin films were grown with good adhesion by spray pyrolysis deposition (SPD) on Ti, ITO and glass substrates at 200 °C. The distance between nozzle and substrate is 30 cm. The composition was prepared by mixing copper chloride CuCl{sub 2}.2H{sub 2}O as a source of Cu{sup 2+} and sodium thiosulfate Na{sub 2}S{sub 2}O{sub 3}.5H{sub 2}O as a source of and S{sup 2−}. Two concentrations (0.2 and 0.4 M) were used for each CuCl{sub 2} and Na{sub 2}S{sub 2}O{sub 3} to be prepared and then sprayed (20 ml). The process was started by spraying the solution for 3 seconds and after 10 seconds the cycle was repeated until the solution was sprayed completely on the hot substrates. The structural characteristics were studied using X-ray diffraction; they showed covellite CuS hexagonal crystal structure for 0.2 M concentration, and covellite CuS hexagonal crystal structure with two small peaks of chalcocite Cu{sub 2}S hexagonal crystal structure for 0.4 M concentration. Also the surface and electrical characteristics were investigated using Field Emission Scanning Electron Microscopy (FESEM) and current source device, respectively. The surface study for the CuS thin films showed nanorods to be established for 0.2 M concentration and mix of nanorods and nanoplates for 0.4 M concentration. The electrical study showed ohmic behavior and low resistivity for these films. Hall Effect was measured for these thin films, it showed that all samples of CuS are p- type thin films and ensured that the resistivity for thin films of 0.2 M concentration was lower than that of 0.4 M concentration; and for the two concentrations CuS thin film deposited on ITO had the lowest resistivity. This leads to the result that the conductivity was high for CuS thin film deposited on ITO substrate, and the conductivity of the three thin films of 0.2 M concentration was higher than that of 0.4 M concentration.

  16. Reactive Sputter Deposition of WO3/Ag/WO3 Film for Indium Tin Oxide (ITO)-Free Electrochromic Devices.

    Science.gov (United States)

    Yin, Yi; Lan, Changyong; Guo, Huayang; Li, Chun

    2016-02-17

    Functioning both as electrochromic (EC) and transparent-conductive (TC) coatings, WO3/Ag/WO3 (WAW) trilayer film shows promising potential application for ITO-free electrochromic devices. Reports on thermal-evaporated WAW films revealed that these bifunctional WAW films have distinct EC characteristics; however, their poor adhesive property leads to rapid degradation of coloring-bleaching cycling. Here, we show that WAW film with improved EC durability can be prepared by reactive sputtering using metal targets. We find that, by introducing an ultrathin tungsten (W) sacrificial layer before the deposition of external WO3, the oxidation of silver, which leads to film insulation and apparent optical haze, can be effectively avoided. We also find that the luminous transmittance and sheet resistance were sensitive to the thicknesses of tungsten and silver layers. The optimized structure for TC coating was obtained to be WO3 (45 nm)/Ag (10 nm)/W (2 nm)/WO3 (45 nm) with a sheet resistance of 16.3 Ω/□ and a luminous transmittance of 73.7%. Such film exhibits compelling EC performance with decent luminous transmittance modulation ΔTlum of 29.5%, fast switching time (6.6 s for coloring and 15.9 s for bleaching time), and long-term cycling stability (2000 cycles) with an applied potential of ±1.2 V. Thicker external WO3 layer (45/10/2/100 nm) leads to larger modulation with maximum ΔTlum of 46.4%, but at the cost of significantly increasing the sheet resistance. The strategy of introducing ultrathin metal sacrificial layer to avoid silver oxidation could be extended to fabricating other oxide-Ag-oxide transparent electrodes via low-cost reactive sputtering.

  17. Electrical Properties Analysis of Copper doped CdTe/CdS Deposited Thin Films on ITO Coated Glass Substrates

    Science.gov (United States)

    Lesinski, Darren; Flaherty, James; Sahiner, M. Alper

    CdTe proves to be a viable source for renewable energy in the form of photovoltaic conversion. While CdTe/CdS naturally provide interesting results adding dopants to the cell can yield higher conversion efficiencies. Copper, famous for its electrical properties, can be used as a dopant in the CdTe layer. In conjunction with its dopant characteristics Copper also improves cell performance by acting as a low resistant and high current back contact. All thin films were synthesized using pulsed laser deposition onto ITO coated glass substrates. The CdS layer across all cells has an approximate thickness of 1500 Angstroms. The following CdTe layer has an approximate thickness of 5500 Angstroms. This created the base cell that was then doped. Cu, typically deposited using sublimation or vapor deposition, was done by PLD as well. Two of the three base cells were treated with Cu using the same deposition parameters. The third cell also received a CdCl treatment on top of the Cu layer to understand the effect when the oxygen layer is deferred. Ellipsometer measurements were used to confirm layer thickness. XRD analysis was used to confirm the presence of Cu and the crystal structure of the thin films. A Hall Effect Measurement system was used to measure active charge carrier concentration introduced by dopant. Also, a Keithley sourcemeter was utilized to determine photovoltaic properties. Notable results discussed will be the effects of Copper dopant on the electrical properties of CdS/CdTe based solar cells.

  18. Polycrystalline ZnSx Se1—x thin films deposited on ITO glass by MBE

    Institute of Scientific and Technical Information of China (English)

    沈大可; SOUI.K.; 韩高荣; 杜丕一; 阙端麟

    2003-01-01

    MBE growth of ZnSx Se1-x thin films on ITO coated glass substrates were carried out using ZnS and Se Sources with the substrate temperature ranging from 270℃ to 330℃.The XRD θ/2θ spectra resulted from these films indicated that the as-grown polycrystalline ZnSx Se1-x thin films had a preferred orientation along the (111) planes.The evaluated crystal sizes as deduced from the FWHM of the XRD layer peaks showed strong growth temperature dependence,with the optimized temperature being about 290℃.Both AFM and TEM measurements of these thin films also indicated a similar growth temperature dependence.Hing qual-ity ZnSx Se1-x thin film growm at the optimized temperature had the smoothest surface with lowest RMS valus of 1.2 nm and TEM cross-sectional micrograph showing a well defined columnar structure.

  19. Preparation and characteristics of indium tin oxide (ITO) thin films at low temperature by r.f. magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    REN Bingyan; LIU Xiaoping; WANG Minhua; XU Ying

    2006-01-01

    Low resistivity and highly transparent ITO conducting films for solar cell applications were fabricated at low temperature by r.f. Magnetron sputtering. ITO films were deposited on glass and silicon substrate. Electrical, optical, structural and morphological properties of the ITO films were investigated in terms of the preparation conditions. The annealing treatment has improved the properties of the ITO films at different degree. The maximum transmittance of the obtained ITO films in the visible range is over 92%, and the low resistivity for the ITO films are about 3.85×10-4Ω·cm at 80℃, 80 W after annealing.

  20. Characteristics of ITO films with oxygen plasma treatment for thin film solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Park, Yong Seob [Department of Photoelectronics Information, Chosun College of Science and Technology, Gwangju (Korea, Republic of); Kim, Eungkwon [Digital Broadcasting Examination, Korean Intellectual Property Office, Daejeon, Suwon 440-746 (Korea, Republic of); Hong, Byungyou [School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong, 300, Jangan-gu, Suwon 440-746 (Korea, Republic of); Lee, Jaehyoeng, E-mail: jaehyeong@skku.edu [School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong, 300, Jangan-gu, Suwon 440-746 (Korea, Republic of)

    2013-12-15

    Graphical abstract: The effect of O{sub 2} plasma treatment on the surface and the work function of ITO films. - Highlights: • ITO films were prepared on the glass substrate by RF magnetron sputtering method. • Effects of O{sub 2} plasma treatment on the properties of ITO films were investigated. • The work function of ITO film was changed from 4.67 to 5.66 eV by plasma treatment. - Abstract: The influence of oxygen plasma treatment on the electro-optical and structural properties of indium-tin-oxide films deposited by radio frequency magnetron sputtering method were investigated. The films were exposed at different O{sub 2} plasma powers and for various durations by using the plasma enhanced chemical vapor deposition (PECVD) system. The resistivity of the ITO films was almost constant, regardless of the plasma treatment conditions. Although the optical transmittance of ITO films was little changed by the plasma power, the prolonged treatment slightly increased the transmittance. The work function of ITO film was changed from 4.67 eV to 5.66 eV at the plasma treatment conditions of 300 W and 60 min.

  1. Light scattering effect of ITO:Zr/AZO films deposited on periodic textured glass surface morphologies for silicon thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Hussain, Shahzada Qamar [Sungkyunkwan University, Department of Energy Science, Suwon (Korea, Republic of); COMSATS Institute of Information Technology, Department of Physics, Lahore (Pakistan); Kwon, Gi Duk; Kim, Sunbo; Balaji, Nagarajan; Shin, Chonghoon; Kim, Sangho; Khan, Shahbaz; Pribat, Didier [Sungkyunkwan University, Department of Energy Science, Suwon (Korea, Republic of); Ahn, Shihyun; Le, Anh Huy Tuan; Park, Hyeongsik; Raja, Jayapal; Lee, Youn-Jung [Sungkyunkwan University, College of Information and Communication Engineering, Suwon (Korea, Republic of); Razaq, Aamir [COMSATS Institute of Information Technology, Department of Physics, Lahore (Pakistan); Velumani, S. [Sungkyunkwan University, College of Information and Communication Engineering, Suwon (Korea, Republic of); Department of Electrical Engineering (SEES), Mexico City (Mexico); Yi, Junsin [Sungkyunkwan University, Department of Energy Science, Suwon (Korea, Republic of); Sungkyunkwan University, College of Information and Communication Engineering, Suwon (Korea, Republic of)

    2015-09-15

    Various SF{sub 6}/Ar plasma-textured periodic glass surface morphologies for high transmittance, haze ratio and low sheet resistance of ITO:Zr films are reported. The SF{sub 6}/Ar plasma-textured glass surface morphologies were changed from low aspect ratio to high aspect ratio with the increase in RF power from 500 to 600 W. The micro- and nano-size features of textured glass surface morphologies enhanced the haze ratio in visible as well as NIR wavelength region. Micro-size textured features also influenced the sheet resistance and electrical characteristics of ITO:Zr films due to step coverage. The ITO:Zr/AZO bilayer was used as front TCO electrode for p-i-n amorphous silicon thin film solar cells with current density-voltage characteristics as: V{sub oc} = 875 mV, FF = 70.90 %, J{sub sc} = 11.31 mA/cm{sup 2}, η = 7.02 %. (orig.)

  2. Effects of ITO precursor thickness on transparent conductive Al doped ZnO film for solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Kang, Dong-Won; Kuk, Seung-Hee; Han, Min-Koo [School of Electrical Engineering, Seoul National University, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Ji, Kwang-Sun; Lee, Heon-Min [LG Electronics, 16 Woomyeon-Dong Seocho-Gu, Seoul (Korea, Republic of)

    2011-01-15

    Al doped ZnO (AZO) film was continuously deposited on ITO precursor on glass substrate by d.c. magnetron sputtering. The thickness of ITO was varied from 30 to 120 nm in order to investigate the effect of ITO thickness on crystallinity of AZO film. X-ray diffraction measurement shows that AZO film grown on ITO has an enhanced (0 0 2) preferred orientation as the ITO thickness was increased. The crystalline structure improvement of AZO film with an increase of ITO precursor thickness is due to the near-epitaxial growth of AZO on ITO precursor. As the ITO thickness was increased, mobility of AZO film by the Hall measurement was significantly increased from 5.4 cm{sup 2}/V s (no ITO) to 23.6 cm{sup 2}/V s (ITO 120 nm), and resistivity was about 81.7% improved from 1.99 x 10{sup -3} to 3.63 x 10{sup -4} {omega} cm. The AZO films with ITO revealed excellent average transmission of visible (90.0%) and NIR (89.6%) regions, whereas those of AZO film without ITO were 82.1% and 88.1%, respectively. The haze values of AZO film with ITO of 90 and 120 nm are similar or higher than those of AZO film without ITO. The surface textured AZO film with ITO precursor is promising for optoelectronic applications such as the front TCO of thin film solar cells. (author)

  3. Mediatorless bioelectrocatalysis of dioxygen reduction at indium-doped tin oxide (ITO) and ITO nanoparticulate film electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Rozniecka, Ewa; Jonsson-Niedziolka, Martin; Sobczak, Janusz W. [Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224 Warszawa (Poland); Opallo, Marcin, E-mail: mopallo@ichf.edu.pl [Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224 Warszawa (Poland)

    2011-10-01

    Highlights: > We introduced ITO nanoparticulate films for enzyme immobilization. > The material promotes mediatorless bioelectrocatalysis towards dioxygen reduction. > The electrocatalytical current increase with the thickness of nanoparticulate film. > There is no difference in electrocatalytic current in the presence or absence of mediator. > The stability of the electrode can be improved by crosslinking of the enzyme with bovine serum albumin and glutaraldehyde. - Abstract: Bilirubin oxidase was immobilised on ITO electrodes: bare or covered by ITO nanoparticulate film. The latter material was obtained by immersion and withdrawal of the substrate into ITO nanoparticles suspension. Formation of a protein deposit was confirmed by scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy. The electrode surface is covered by a protein film in the form of globular aggregates and it exhibits mediatorless electrocatalytic activity towards dioxygen reduction to water at pH 4.8. Modification of the electrode with ITO particles increases its catalytic activity about ten times up to 110 {mu}A cm{sup -2} seen for electrodes prepared by twelve immersion and withdrawal steps into ITO nanoparticle suspension. The catalytic activity is almost unaffected by addition of mediator to solution. The stability of the electrodes is increased by cross-linking of the enzyme with bovine serum albumin and glutaraldehyde. This electrode was applied as biocathode in a zinc-dioxygen battery operating in 0.1 mol dm{sup -3} McIlvaine buffer (pH 4.8).

  4. Ion beam codeposition of HTSC films on SrTiO3 and ITO/Si

    Science.gov (United States)

    Pavuna, Davor; Kellett, Bruce J.; Dwir, Benjamin; James, Jonathan H.; Gauzzi, Andrea; Faulkner, James R., Jr.; Affronte, M.; Reinhardt, F. K.

    1990-10-01

    Superconducting YBa2C u 3 0 7 (YBCO) thin films were grown on Si with transparent, conducting Indium Tin Oxide (ITO) buffer layers The onset temperature at 92K and zero resistance at 68K were measured. Both, ITO and YBCO films were deposited by ion beam co-deposition. The YBCO/ITO films exhibit metallic resistivity with positive slopes (r0.055 1K). The YBCO is uniform, textured and polycrystalline. The relevance for hybrid opto-electronic device structures is briefly discussed.

  5. High-Transparency Sputtered In2O3 and ITO Films Containing Zirconium (Presentation)

    Energy Technology Data Exchange (ETDEWEB)

    Gessert, T. A.; Yoshida, Y.; Fesenmaier, C. C.; Coutts, T. J.

    2007-10-01

    Our recent investigations have identified a method to produce ITO-like films that are less sensitive to variations in the oxygen-containing deposition ambient. Specifically, we are studying the effect of adding small amounts of Zr to both In2O3 and ITO ceramic sputtering targets.

  6. Structure, optical and electrical properties of Bi{sub 2}VO{sub 5.5} films deposited on ITO/glass substrates by chemical solution method

    Energy Technology Data Exchange (ETDEWEB)

    Guo Ming; Liu Changxin [College of Electronics and Information Engineering, Jingganshan University, ji' an, jiangxi 343009 (China); Shen Yude; Yang Pingxiong, E-mail: pxyang@ee.ecnu.edu.cn [Key Laboratory of Polar Materials and Devices, Department of Electronics, East China Normal University, 500 Dongchuan Rd, Shanghai 200241 (China)

    2011-02-01

    Bismuth vanadate (Bi{sub 2}VO{sub 5.5}) thin films were fabricated on indium-doped tin oxide (ITO)-coated glass substrates by chemical solution method combined with a rapid thermal annealing process. The structure of the films was characterized with X-ray diffraction and atomic force microscopy. The Bi{sub 2}VO{sub 5.5} films annealed at 600 deg. C showed a good match with the ITO coated glass substrates and had a desired perovskite structure with high (00l) preferred orientation. The spherical grains with a homogeneous distribution of high crystallinity and packing density were observed. Optical properties of the Bi{sub 2}VO{sub 5.5} thin films were studied by Raman spectra and the lattice vibration modes of the films were obtained. A low frequency dielectric dispersion was observed in the films. Dielectric constant and loss was about 75 and 0.076 at 10kHz, respectively. The ac conductivity obeyed Jonscher's universal power law, which may be originated a possible hopping mechanism for Bi{sub 2}VO{sub 5.5} thin films. The complex impedance traces revealed material dielectric dispersion nature and the presence of grain effects in the films.

  7. Structure, optical and electrical properties of Bi2VO5.5 films deposited on ITO/glass substrates by chemical solution method

    Science.gov (United States)

    Guo, Ming; Shen, Yude; Liu, Changxin; Yang, Pingxiong

    2011-02-01

    Bismuth vanadate (Bi2VO5.5) thin films were fabricated on indium-doped tin oxide (ITO)-coated glass substrates by chemical solution method combined with a rapid thermal annealing process. The structure of the films was characterized with X-ray diffraction and atomic force microscopy. The Bi2VO5.5 films annealed at 600 °C showed a good match with the ITO coated glass substrates and had a desired perovskite structure with high (00l) preferred orientation. The spherical grains with a homogeneous distribution of high crystallinity and packing density were observed. Optical properties of the Bi2VO5.5 thin films were studied by Raman spectra and the lattice vibration modes of the films were obtained. A low frequency dielectric dispersion was observed in the films. Dielectric constant and loss was about 75 and 0.076 at 10kHz, respectively. The ac conductivity obeyed Jonscher's universal power law, which may be originated a possible hopping mechanism for Bi2VO5.5 thin films. The complex impedance traces revealed material dielectric dispersion nature and the presence of grain effects in the films.

  8. Pulsed laser deposition of tin-doped indium oxide (ITO) on polycarbonate

    Energy Technology Data Exchange (ETDEWEB)

    Yong, T.K. [Faculty of Engineering, Multimedia University, 63100 Cyberjaya, Selangor (Malaysia); Tou, T.Y. [Faculty of Engineering, Multimedia University, 63100 Cyberjaya, Selangor (Malaysia)]. E-mail: tytou@mmu.edu.my; Teo, B.S. [Faculty of Engineering, Multimedia University, 63100 Cyberjaya, Selangor (Malaysia)

    2005-07-30

    Indium tin oxide (ITO) films were deposited on polycarbonate (PC) substrates in oxygen at room temperature by pulsed laser deposition (PLD) using a Nd:YAG laser with 355 and 532 nm wavelengths. The ITO films were analyzed by the four-point probe technique, atomic force microscopy (AFM) and UV-visible-Near IR spectrophotometry for electrical conductivity, surface morphological and optical transmission properties, respectively. The main plume species were identified by using a fiber optic spectrometer, which showed that the emission intensity produced by the 355 nm laser wavelength was considerably stronger than that produced by the 532 nm laser wavelength. The ITO film resistivity was an order of magnitude higher than that achieved by a KrF excimer laser, but comparable to ITO-coated substrates prepared by the sputtering method.

  9. Preferential orientation growth of ITO thin film on quartz substrate with ZnO buffer layer by magnetron sputtering technique

    Science.gov (United States)

    Du, Wenhan; Yang, Jingjing; Xiong, Chao; Zhao, Yu; Zhu, Xifang

    2017-07-01

    In order to improve the photoelectric transformation efficiency of thin-film solar cells, one plausible method was to improve the transparent conductive oxides (TCO) material property. In-doped tin oxide (ITO) was an important TCO material which was used as a front contact layer in thin-film solar cell. Using magnetron sputtering deposition technique, we prepared preferential orientation ITO thin films on quartz substrate. XRD and SEM measurements were used to characterize the crystalline structure and morphology of ITO thin films. The key step was adding a ZnO thin film buffer layer before ITO deposition. ZnO thin film buffer layer increases the nucleation center numbers and results in the (222) preferential orientation growth of ITO thin films.

  10. Thickness dependent optical properties of PEMA and (PEMA){sub 0.85}/(ZnO){sub 0.15} nanocomposite films deposited by spray pyrolysis technique on ITO substrate

    Energy Technology Data Exchange (ETDEWEB)

    Thakur, Anjna, E-mail: anjna56@gmail.com; Thakur, Priya; Yadav, Kamlesh, E-mail: kamlesh.yadav001@gmail.com [Centre for Physical Sciences, Central University of Punjab, Bathinda-151001 (India)

    2016-05-06

    In this paper, poly (ethyl methacrylate) (PEMA) and (PEMA){sub 0.85}/(ZnO){sub 0.15} nanocomposite films for 2, 3, 4 and 5 minutes have been deposited by spray pyrolysis technique on indium tin oxide (ITO) coated substrate. The effect of thickness of the film on the morphological and optical properties of PEMA and (PEMA){sub 0.85}/(ZnO){sub 0.15} nanocomposite films are studied. The morphological and optical properties of pure PEMA and (PEMA){sub 0.85}/(ZnO){sub 0.15} nanocomposite films are compared. The field emission scanning electron microscopy (FESEM) shows that as the thickness of film increases, uniformity of films increases. It is found from UV-Visible spectra that the energy band gap decreases with increasing the deposition time and refractive index increases with increasing the thickness of the film. The band gap of the nanocomposites is found less than the pure polymer film and opposite trend is observed for refractive index. The optical absorption of PEMA/ZnO nanocomposite films is higher than pure PEMA film. The thickness of the nanocomposite film plays a significant role in the tunability of the optical properties.

  11. Photoelectrochemical Properties of Bacteriorhodopsin Langmuir-Blodgett Films on ITO Conductive Electrode

    Institute of Scientific and Technical Information of China (English)

    王建平; 李津如; 陶培德; 李兴长; 江龙

    1994-01-01

    Langmuir-Blodgett films containing bacteriorhodopsin were deposited on ITO conduc-tive electrodes.A sandwiched photocell with a junction structure of ITO/bR/electrolyte/ITO has beenconstructed,in which the bR LB film was directly put into contact with an aqueous electrolyte immobi-lized in an agar gel.Under visible light irradiation,the photocell produced a transient photocurrent due tothe change of light intensity,which characterized vision imitative material.A photoalarm device based ondifferential responsivity phenomena was fabricated.

  12. Modulus of Elasticity and Thermal Expansion Coefficient of ITO Film

    Energy Technology Data Exchange (ETDEWEB)

    Carter, Austin D. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Elhadj, S. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2016-06-24

    The purpose of this experiment was to determine the modulus of elasticity (E) and thermal expansion coefficient (α) of RF sputtered Indium Tin Oxide (ITO) as a function of temperature (T), and to collect ITO film stress data. In order to accomplish that goal, the Toho FLX-2320-S thin film stress measurement machine was used to collect both single stress and stress-temperature data for ITO coated fused silica and sapphire substrates. The stress measurement function of the FLX-2320-S cannot be used to calculate the elastic modulus of the film because the Stoney formula incorporates the elastic modulus of the substrate, rather than of the film itself.

  13. ITO玻璃表面电化学沉积氧化锌薄膜及其润湿性研究%Preparation and Wettability Study of Zinc Oxide Films by Electrochemical Deposition on ITO Glass

    Institute of Scientific and Technical Information of China (English)

    梅芳; 弓满锋

    2014-01-01

    ITO glass is of global interest nowadays in semiconductor and sensor application.It has al-ready been an excellent substrate for constructing various IT devices and sensors,because of its electronics such as fast electron transfer kinetics,non-toxicity,chemical stability,and high electron communication features.In the paper,the film with ZnO nanostructures modified ITO glass was fabricated by electro-chemical deposition.SEM,XRD and ZYGO were used to characterize the properties of ZnO on ITO. Then,the contact angles were measured to characterize and compare the wettability of ITO glass and its modified ITO glass by zinc oxide films.The above experimental results were synthetically studied,the surface morphology of ITO conductive glass (with ZnO thin film on its surface and without)and its influ-ence on surface wettability were comparatively analysis.The results show that the relatively perfect and smooth nanoscale ZnO crystal structure can be obtained by electrochemical deposition on the surface of the ITO conductive glass,and the structure shows preferred orientation characteristic.Though depositing nanoscale ZnO film may cause the surface roughness decreased,but it can changes the hydrophobic proper-ties of the ITO conductive glass surface.%ITO导电玻璃具有许多优越的特性,如高透过率、高导电性、无毒无害以及优良的化学稳定性,因而广泛应用于半导体和传感器等电子工业领域,可作为基体材料应用在 IT仪器或传感器中。本文采用电化学沉积法在ITO导电玻璃表面沉积得到氧化锌薄膜结构,通过 SEM观察纳米氧化锌薄膜表面形貌,用 XRD分析薄膜的成分和晶体生长情况,用ZYGO激光干涉仪测量了其表面粗糙度,用接触角测量仪测量膜层表面与水的接触角。综合上述实验结果对比分析了 ITO导电玻璃表面有无氧化锌薄膜时表面形貌的变化,及其对表面润湿性的影响。结果表明:在 ITO导电玻璃表

  14. Transparent conducting AZO and ITO films produced by pulsed laser ablation at 355 nm

    DEFF Research Database (Denmark)

    Thestrup, B.; Schou, Jørgen

    1999-01-01

    Thin films of aluminium-doped zinc oxide (AZO) and indium tin oxide (ITO) were deposited on glass substrates by laser ablation in an oxygen environment. The electrical and optical properties of films grown at various oxygen pressures were compared. With no substrate heating, highly transparent...

  15. Effects of high dose gamma irradiation on ITO thin film properties

    Energy Technology Data Exchange (ETDEWEB)

    Alyamani, A. [National Nanotechnology Center, King Abdul-Aziz City for Science and Technology (KACST), Riyadh (Saudi Arabia); Mustapha, N., E-mail: nazirmustapha@hotmail.com [Dept. of Physics, College of Sciences, Al Imam Mohammad Ibn Saud Islamic University, P.O. Box 90950, Riyadh 11623 (Saudi Arabia)

    2016-07-29

    Transparent thin-film Indium Tin Oxides (ITO) were prepared on 0.7 mm thick glass substrates using a pulsed laser deposition (PLD) process with average thickness of 150 nm. The samples were then exposed to high gamma γ radiation doses by {sup 60}Co radioisotope. The films have been irradiated by performing exposure cycles up to 250 kGy total doses at room temperature. The surface structures before and after irradiation were analysed by x-ray diffraction. Atomic Force Microscopy (AFM) was performed on all samples before and after irradiation to investigate any change in the grain sizes, and also in the roughness of the ITO surface. We investigated the influence of γ irradiation on the spectra of transmittance T, in the ultraviolet-visible-near infrared spectrum using spectrophotometer measurements. Energy band gap E{sub g} was then calculated from the optical spectra for all ITO films. It was found that the optical band gap values decreased as the radiation dose was increased. To compare the effect of the irradiation on refractive index n and extinction coefficient k properties, additional measurements were done on the ITO samples before and after gamma irradiation using an ellipsometer. The optical constants n and k increased by increasing the irradiation doses. Electrical properties such as resistivity and sheet resistance were measured using the four-point probe method. The good optical, electrical and morphological properties maintained by the ITO films even after being exposed to high gamma irradiation doses, made them very favourable to be used as anodes for solar cells and as protective coatings in space windows. - Highlights: • Indium Tin Oxide (ITO) thin films were deposited by pulsed laser deposition. • Effects of Gamma irradiation were investigated. • Changes of optical transmission and electrical properties of ITO films were studied. • Intensity of the diffraction peaks and the film's structure changed with increasing irradiation doses.

  16. Sol-gel synthesis, characterization and optical properties of mercury-doped TiO{sub 2} thin films deposited on ITO glass substrates

    Energy Technology Data Exchange (ETDEWEB)

    Mechiakh, R., E-mail: raouf_mechiakh@yahoo.fr [Departement de Medecine, Faculte de Medecine, Universite Hadj Lakhdar, Batna (Algeria); Laboratoire de Photovoltaique de Semi-conducteurs et de Nanostructures, Centre de Recherche des Sciences et Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia); Ben Sedrine, N.; Chtourou, R. [Laboratoire de Photovoltaique de Semi-conducteurs et de Nanostructures, Centre de Recherche des Sciences et Technologies de l' Energie, BP 95, Hammam-Lif 2050 (Tunisia)

    2011-08-15

    The Hg-doped and undoped nano-crystalline TiO{sub 2} films on ITO glass substrates surface and polycrystalline powders were prepared by sol-gel dip coating technique. The crystal structure and surface morphology of TiO{sub 2} were characterized by means of X-ray diffractometer (XRD), atomic force microscope (AFM), spectrophotometer, Fourier-transform infrared (FTIR), and spectroscopic ellipsometry (SE). The results indicated that the powder of TiO{sub 2}, doped with 5% Hg in room temperature was only composed of the anatase phase whereas in the undoped powder exhibits an amorphous phase were present. After heat treatments of thin films, titanium oxide starts to crystallize at the annealing temperature 400 {sup o}C. The average crystallite size of the undoped TiO{sub 2} films was about 8.17 nm and was increased with Hg-doping in the TiO{sub 2} films. Moreover, the grains distributed more uniform and the surface roughness was greater in the Hg-doped TiO{sub 2} films than in the undoped one. Refractive index and porosity were calculated from the measured transmittance spectrum. The values of the index of refraction are in the range (1.95-2.49) and the porosity is in the range (47-2.8). The coefficient of transmission varies from 60 to 90%. SE study was used to determine the annealing temperature effect on the optical properties in the wavelength range from 0.25 to 2 {mu}m and the optical gap of the Hg-doped TiO{sub 2} thin films.

  17. ITO-MgF2 Film Development for PowerSphere Polymer Surface Protection

    Science.gov (United States)

    Hambourger, Paul D.; Kerslake, Thomas W.; Waters, Deborah L.

    2004-01-01

    Multi-kilogram class microsatellites with a PowerSphere electric power system are attractive for fulfilling a variety of potential NASA missions. However, PowerSphere polymer surfaces must be coated with a film that has suitable electrical sheet resistivity for electrostatic discharge control, be resistant to atomic oxygen attack, be transparent to ultraviolet light for composite structure curing and resist ultraviolet light induced darkening for efficient photovoltaic cell operation. In addition, the film must be tolerant of polymer layer folding associated with launch stowage of PowerSphere inflatable structures. An excellent film material candidate to meet these requirements is co-sputtered, indium oxide (In2O3) - tin oxide (SnO2), known as 'ITO', and magnesium fluoride (MgF2). While basic ITO-MgF2 film properties have been the subject of research over the last decade, further research is required in the areas of film durability for space-inflatable applications and precise film property control for large scale commercial production. In this paper, the authors present film durability results for a folded polymer substrate and film resistance to vacuum UV darkening. The authors discuss methods and results in the area of film sheet resistivity measurement and active control, particularly dual-channel, plasma emission line measurement of ITO and MgF2 plasma sources. ITO-MgF2 film polymer coupon preparation is described as well as film deposition equipment, procedures and film characterization. Durability testing methods are also described. The pre- and post-test condition of the films is assessed microscopically and electrically. Results show that an approx. 500A ITO-18vol% MgF2 film is a promising candidate to protect PowerSphere polymer surfaces for Earth orbit missions. Preliminary data also indicate that in situ film measurement methods are promising for active film resistivity control in future large scale production. Future film research plans are also

  18. Depth dependent properties of ITO thin films grown by pulsed DC sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sytchkova, A., E-mail: anna.sytchkova@enea.it [ENEA Optical Coatings Laboratory, via Anguillarese 301, 00123 Rome (Italy); Zola, D. [ENEA Optical Coatings Laboratory, via Anguillarese 301, 00123 Rome (Italy); Bailey, L.R.; Mackenzie, B.; Proudfoot, G. [Oxford Instruments Plasma Technology, Yatton, Bristol, BS49 4AP (United Kingdom); Tian, M. [NT-MDT Europe BV, High Tech Campus 83, 5656 AG Eindhoven (Netherlands); Ulyashin, A. [SINTEF Materials and Chemistry, Forskningsveien 1, P.O. 124 Blindern, NO-0314 Oslo (Norway)

    2013-05-15

    A systematically prepared set of ITO layers for solar cell applications has been analyzed by spectroscopic variable angle ellipsometry in order to trace the dependence of free carriers’ distribution along the film depth as a function of film thickness as well as its change upon annealing. Samples were deposited on silicon substrates with various thicknesses in steps of approximately 10–20 nm. This set was duplicated and these samples were annealed, so that for each thickness an as-deposited and an annealed sample is available. Conventionally measured electrical conductivity and morphological properties (AFM measurements) of the films have been compared with the optical constants’ inhomogeneity, i.e. material properties along the film thickness modelled by variable-angle spectroscopic ellipsometry. The obtained results show that the optical as well as electrical properties of thin ITO films prepared by pulsed DC sputtering are depth dependent. For the deposition conditions used a well-determined reproducible non-uniform distribution of free carriers within the film thickness was determined. In particular it has been found that the majority of free carriers in as-deposited ultra-thin ITO films is concentrated at sample half-depth, while their distribution becomes asymmetric for the thicker films, with a maximum located at approximately 40 nm depth. The distribution of free carriers in annealed samples is qualitatively different from that of as-deposited layers.

  19. Characterization of ITO/CdO/glass thin films evaporated by electron beam technique

    Directory of Open Access Journals (Sweden)

    Hussein Abdel-Hafez Mohamed and Hazem Mahmoud Ali

    2008-01-01

    Full Text Available A thin buffer layer of cadmium oxide (CdO was used to enhance the optical and electrical properties of indium tin oxide (ITO films prepared by an electron-beam evaporation technique. The effects of the thickness and heat treatment of the CdO layer on the structural, optical and electrical properties of ITO films were carried out. It was found that the CdO layer with a thickness of 25 nm results in an optimum transmittance of 70% in the visible region and an optimum resistivity of 5.1×10−3 Ω cm at room temperature. The effect of heat treatment on the CdO buffer layer with a thickness of 25 nm was considered to improve the optoelectronic properties of the formed ITO films. With increasing annealing temperature, the crystallinity of ITO films seemed to improve, enhancing some physical properties, such as film transmittance and conductivity. ITO films deposited onto a CdO buffer layer heated at 450 °C showed a maximum transmittance of 91% in the visible and near-infrared regions of the spectrum associated with the highest optical energy gap of 3.61 eV and electrical resistivity of 4.45×10−4 Ω cm at room temperature. Other optical parameters, such as refractive index, extinction coefficient, dielectric constant, dispersion energy, single effective oscillator energy, packing density and free carrier concentration, were also studied.

  20. Thermally induced evolution of sol–gel grown WO3 films on ITO/glass substrates

    NARCIS (Netherlands)

    Caruso, T.; Castriota, M.; Policicchio, A.; Fasanella, A.; Santo, M.P. De; Ciuchi, F.; Desiderio, G.; Rosa, S. La; Rudolf, P.; Agostino, R.G.; Cazzanelli, E.

    2014-01-01

    The electronic, morphological and structural properties of WO3 thin films, synthesized via a sol-gel route and deposited on ITO/glass substrates by spin-coating, were analyzed as a function of annealing temperature (100-700 degrees C range) by Scanning Electron Microscopy, Atomic Force Microscopy, m

  1. In Situ Synthesis and Deposition of Gold Nanoparticles with Different Morphologies on Glass and ITO Substrate by Ultrasonic Spray Pyrolysis

    Directory of Open Access Journals (Sweden)

    María de la Garza

    2013-01-01

    Full Text Available Gold nanoparticles were synthesized and deposited in situ by ultrasonic spray pyrolysis on glass and indium tin oxide (ITO substrates. This technique led to the formation of gold nanoparticles with different morphologies without the use of any capping agent. The gold nanoparticles deposited on glass substrate were obtained as nanospheres with an average particle size of 30 nm with some agglomerates; however, the nanoparticles deposited on ITO substrate were obtained with different morphologies, such as triangular nanoprisms, nanorods, nanocubes, and nanorhombus, with particle sizes between 40 and 100 nm. The ITO substrate influenced the morphology of the gold nanoparticles obtained due to changes in the deposition temperature, which also change the crystalline structure of the ITO film on the substrate.

  2. Properties of photoelectricity of WOx-doped ITO thin films

    Science.gov (United States)

    Liu, Ye; Li, Zhuying; Wang, Chong; Liu, Hui; Luo, Shan

    2010-10-01

    Indium-tin-oxide (ITO) film is an n-semiconductor transparent conductive film. It has many good properties: conductivity, transmittance in visible region, absorptivity in ultraviolet. And tungsten oxide has good conductivity and it can keep stable structure in high temperature, also it has wearable and anti-corrupt properties. Therefore, tungsten oxide can be added gradually on ITO thin films by magnetron sputtering to research the optical and electrical performance of the doped films. We research the performance of the doped films in five aspects: X-ray diffraction spectroscopy, Scanning electron microscope are used to investigate the crystal structure, surface morphology. UV-visible spectroscopy is used to display the transmittance and absorption spectrum of the films. The thin films' performance of electrochemistry is tested by the workstation of electrochemistry. Its conductivity is tested by Four-probe sheet resistivity meter. The main conclusion: The analysis of SEM results shows that the surface morphology of the films is granulated. Transmittance spectrums suggest that the transmittance of ITO films have been increased by proper doping, the percentage of transmittance is over 90% from visible to near-infrared region. Besides, it shows well in the properties of electricity and electrochemistry in the doped films.

  3. Fabrication of dye solar cell on flexible substrate using ITO-PEN film

    Science.gov (United States)

    Sahmer, Ahmad Zahrin; Mohamed, Norani Muti

    2012-09-01

    Dye solar cell based on nanocrystalline TiO2 has the potential to reach low cost in future indoor power applications. To realize its application for powering the electrical appliances, dye solar cell (DSC) must be made mechanically robust and flexible where indium-doped tin oxide (ITO-PEN) film substrate will be used as the working electrode. In terms of fabrication process, the ITO-PEN film is easier to handle in a process such as cutting of larger film sheet into smaller individual modules or cell. Moreover the processing of the film into complete flexible solar cells can be realized by means of a continuous roll to roll production process. The paper reports the study on the fabrication of dye solar cell on the flexible ITO-PEN. Here, the temperature constraint in the sintering process is addressed by using low temperature of 150°C and further enhanced with direct heat on the photo-electrode at 140°C to achieve a good bonding between the ITO and the deposited TiO2 film. The TiO2 coated ITO-PEN substrate was then soaked in commercial N719 dye, assembled into test cell, and tested under the standard test condition at irradiance of 1000 W/m2 with AM1.5 solar simulator. The fabricated flexible ITO-PEN DSC test cell was found to have an efficiency of 2.1% which is comparatively lower to DSC cell based on TCO rigid glass. This is attributed to the overall higher internal resistance of TiO2 film as a result of incomplete decomposition of ethyl cellulose at low sintering temperature.

  4. ZnSe/ITO thin films: candidate for CdTe solar cell window layer

    Science.gov (United States)

    Khurram, A. A.; Imran, M.; Khan, Nawazish A.; Nasir Mehmood, M.

    2017-09-01

    The crystal structure, electrical and optical properties of ZnSe thin films deposited on an In2O3:Sn (ITO) substrate are evaluated for their suitability as the window layer of CdTe thin film solar cells. ZnSe thin films of 80, 90, and 100 nm thickness were deposited by a physical vapor deposition method on Indium tin oxide coated glass substrates. The lattice parameters are increased to 5.834 Å when the film thickness was 100 nm, which is close to that of CdS. The crystallite size is decreased with the increase of film thickness. The optical transmission analysis shows that the energy gap for the sample with the highest thickness has also increased and is very close to 2.7 eV. The photo decay is also studied as a function of ZnSe film thickness.

  5. Influence of sputtering power on the optical properties of ITO thin films

    Energy Technology Data Exchange (ETDEWEB)

    K, Aijo John; M, Deepak, E-mail: manju.thankamoni@gmail.com; T, Manju, E-mail: manju.thankamoni@gmail.com [Department of Physics, Sree Sankara College, Kalady P. O., Ernakulam Dist., Kerala (India); Kumar, Vineetha V. [Dept. of Physics, K. E. College, Mannanam, Kottayam Dist., Kerala (India)

    2014-10-15

    Tin doped indium oxide films are widely used in transparent conducting coatings such as flat panel displays, crystal displays and in optical devices such as solar cells and organic light emitting diodes due to the high electrical resistivity and optical transparency in the visible region of solar spectrum. The deposition parameters have a commendable influence on the optical and electrical properties of the thin films. In this study, ITO thin films were prepared by RF magnetron sputtering. The properties of the films prepared under varying sputtering power were compared using UV- visible spectrophotometry. Effect of sputtering power on the energy band gap, absorption coefficient and refractive index are investigated.

  6. Influence of sputtering power on the optical properties of ITO thin films

    Science.gov (United States)

    K, Aijo John; Kumar, Vineetha V.; M, Deepak; T, Manju

    2014-10-01

    Tin doped indium oxide films are widely used in transparent conducting coatings such as flat panel displays, crystal displays and in optical devices such as solar cells and organic light emitting diodes due to the high electrical resistivity and optical transparency in the visible region of solar spectrum. The deposition parameters have a commendable influence on the optical and electrical properties of the thin films. In this study, ITO thin films were prepared by RF magnetron sputtering. The properties of the films prepared under varying sputtering power were compared using UV- visible spectrophotometry. Effect of sputtering power on the energy band gap, absorption coefficient and refractive index are investigated.

  7. Effect of Sheet Resistance and Morphology of ITO Thin Films on Polymer Solar Cell Characteristics

    Directory of Open Access Journals (Sweden)

    Ram Narayan Chauhan

    2012-01-01

    Full Text Available Solar cell fabrication on flexible thin plastic sheets needs deposition of transparent conducting anode layers at low temperatures. ITO thin films are deposited on glass by RF sputtering at substrate temperature of 70∘C and compare their phase, morphology, optical, and electrical properties with commercial ITO. The films contain smaller nanocrystallites in (222 preferred orientation and exhibit comparable optical transmittance (~95% in the wavelength range of 550–650 nm, but high sheet resistance of ~103 Ω/□ (the value being ~36 Ω/□ for commercial ITO.The polymer solar cells with PEDOT: PSS and P3HT: PCBM layers realized on RF sputtered vis-a-vis commercial ITO thin films are shown to display a marginal difference in power conversion efficiency, low fill factor, and low open-circuit voltage but increased short-circuit current density. The decrease in fill factor, open-circuit voltage is compensated by increased short-circuit current. Detailed study is made of increased short-circuit current density.

  8. Roll-to-Roll sputtered ITO/Cu/ITO multilayer electrode for flexible, transparent thin film heaters and electrochromic applications

    Science.gov (United States)

    Park, Sung-Hyun; Lee, Sang-Mok; Ko, Eun-Hye; Kim, Tae-Ho; Nah, Yoon-Chae; Lee, Sang-Jin; Lee, Jae Heung; Kim, Han-Ki

    2016-01-01

    We fabricate high-performance, flexible, transparent electrochromic (EC) films and thin film heaters (TFHs) on an ITO/Cu/ITO (ICI) multilayer electrode prepared by continuous roll-to-roll (RTR) sputtering of ITO and Cu targets. The RTR-sputtered ICI multilayer on a 700 mm wide PET substrate at room temperature exhibits a sheet resistance of 11.8 Ω/square and optical transmittance of 73.9%, which are acceptable for the fabrication of flexible and transparent EC films and TFHs. The effect of the Cu interlayer thickness on the electrical and optical properties of the ICI multilayer was investigated in detail. The bending and cycling fatigue tests demonstrate that the RTR-sputtered ICI multilayer was more flexible than a single ITO film because of high strain failure of the Cu interlayer. The flexible and transparent EC films and TFHs fabricated on the ICI electrode show better performances than reference EC films and TFHs with a single ITO electrode. Therefore, the RTR-sputtered ICI multilayer is the best substitute for the conventional ITO film electrode in order to realize flexible, transparent, cost-effective and large-area EC devices and TFHs that can be used as flexible and smart windows. PMID:27653830

  9. ITO electrode modified by self-assembling multilayer film of polyoxometallate on poly(vinyl alcohol) nanofibers and its electrocatalytic behavior

    Energy Technology Data Exchange (ETDEWEB)

    Shan Yuping [Key Laboratory of Polyoxometalates Science of Ministry of Education, Northeast Normal University, Changchun 130024 (China); Yang Guocheng [Key Laboratory of Polyoxometalates Science of Ministry of Education, Northeast Normal University, Changchun 130024 (China); State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Sun Yongling [Key Laboratory of Polyoxometalates Science of Ministry of Education, Northeast Normal University, Changchun 130024 (China); Pang Shujie [Key Lab of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130023 (China); Gong Jian [Key Laboratory of Polyoxometalates Science of Ministry of Education, Northeast Normal University, Changchun 130024 (China)], E-mail: gongj823@nenu.edu.cn; Su Zhongmin; Qu Lunyu [Key Laboratory of Polyoxometalates Science of Ministry of Education, Northeast Normal University, Changchun 130024 (China)

    2007-12-01

    Poly(vinyl alcohol) (PVA) nanofiber mats were collected on indium tin oxide (ITO) substrate by electrospinning method. A multilayer film composed of {alpha}-[P{sub 2}W{sub 18}O{sub 62}]{sup 6-} (abbr. P{sub 2}W{sub 18}), a polyoxometallate (POM) anion, and poly(diallymethylammonium chloride) (abbr. PDDA) was fabricated by layer-by-layer (LBL) self-assembly technique on the PVA/ITO electrode. The PDDA/P{sub 2}W{sub 18} multilayer film could be unselectively or selectively deposited on the PVA/ITO electrode via changing the amount of PVA nanofibers on the ITO substrate. The scanning electron microscope (SEM) images showed that when the electrospun time was short the PDDA/P{sub 2}W{sub 18} multilayer film was unselectively deposited on PVA nanofiber mats because the amount of PVA nanofibers was too little to cover most of the ITO substrate. However, when the electrospun time was long enough, the PDDA/P{sub 2}W{sub 18} multilayer film was selectively deposited on PVA nanofiber mats because of the larger surface area and higher surface energy of PVA nanofibers in comparison with the flat ITO substrate. Growth process of the multilayer film was determined by cyclic voltammetry (CV). Electrocatalytic effects of the PDDA/P{sub 2}W{sub 18} multilayer film unselectively and selectively deposited on the PVA/ITO electrode on NO{sub 2}{sup -} were observed.

  10. ITO electrode modified by self-assembling multilayer film of polyoxometallate on poly(vinyl alcohol) nanofibers and its electrocatalytic behavior

    Energy Technology Data Exchange (ETDEWEB)

    Shan, Yuping; Sun, Yongling; Gong, Jian; Su, Zhongmin; Qu, Lunyu [Northeast Normal University, Changchun (China). Key Laboratory of Polyoxometalates Science of Ministry of Education; Yang, Guocheng [Northeast Normal University, Changchun (China). Key Laboratory of Polyoxometalates Science of Ministry of Education; Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun (China). State Key Laboratory of Electroanalytical Chemistry; Pang, Shujie [Jilin University, Changchun (China). College of Chemistry, Key Lab of Supramolecular Structure and Materials

    2007-12-01

    Poly(vinyl alcohol) (PVA) nanofiber mats were collected on indium tin oxide (ITO) substrate by electrospinning method. A multilayer film composed of {alpha}-[P{sub 2}W{sub 18}O{sub 62}]{sup 6-} (abbr. P{sub 2}W{sub 18}), a polyoxometallate (POM) anion, and poly(diallymethylammonium chloride) (abbr. PDDA) was fabricated by layer-by-layer (LBL) self-assembly technique on the PVA/ITO electrode. The PDDA/P{sub 2}W{sub 18} multilayer film could be unselectively or selectively deposited on the PVA/ITO electrode via changing the amount of PVA nanofibers on the ITO substrate. The scanning electron microscope (SEM) images showed that when the electrospun time was short the PDDA/P{sub 2}W{sub 18} multilayer film was unselectively deposited on PVA nanofiber mats because the amount of PVA nanofibers was too little to cover most of the ITO substrate. However, when the electrospun time was long enough, the PDDA/P{sub 2}W{sub 18} multilayer film was selectively deposited on PVA nanofiber mats because of the larger surface area and higher surface energy of PVA nanofibers in comparison with the flat ITO substrate. Growth process of the multilayer film was determined by cyclic voltammetry (CV). Electrocatalytic effects of the PDDA/P{sub 2}W{sub 18} multilayer film unselectively and selectively deposited on the PVA/ITO electrode on NO{sub 2}{sup -} were observed. (author)

  11. Tailoring the refractive index of ITO thin films by genetic algorithm optimization of the reactive DC-sputtering parameters

    Science.gov (United States)

    Afshari Pour, Elnaz; Shafai, Cyrus

    2017-02-01

    The variation of oxygen concentration in the Indium Tin Oxide (ITO) structure highly impacts its electrical and optical characteristics. In this work, we investigated the effect of oxygen partial flow (O2/O2+Ar) and deposition pressure (p) on the refractive index (n) of reactive sputtered ITO thin films. A statistical study with a Genetic Algorithm (GA) optimization was implemented to find optimal deposition conditions for obtaining particular refractive indices. Several samples of ITO thin films with refractive indices ranging from 1.69 - 2.1 were deposited by DC sputtering technique at various oxygen concentrations and deposition pressures, in order to develop the statistical database. A linear polynomial surface was locally fitted to the data of O2/O2+Ar, p, and n of deposited films. This surface was then used as the fitness function of the GA. By defining the desired n as the objective value of the GA, the optimized deposition conditions can be found. Two cases were experimentally demonstrated, with the GA determining the needed process parameters to deposit ITO with n=2.2 and n=1.6. Measured results were very close to desired values, with n=2.25 and n=1.62, demonstrating the effectiveness of this method for predicting needed reactive sputtering conditions to enable arbitrary refractive indices.

  12. ITO薄膜的研究进展%Research Progress of ITO Thin Films

    Institute of Scientific and Technical Information of China (English)

    邱阳; 陈玉峰; 祖成奎; 金扬利

    2016-01-01

    ITO是锡掺杂氧化铟薄膜的简称,属于透明导电氧化物材料。常规沉积方法制备的ITO薄膜通常为非晶态或体心立方晶系晶体,为n型半导体材料,其载流子为自由电子,主要来源于沉积过程中薄膜化学计量比偏离或阳离子掺杂形成的施主杂质。ITO 薄膜是当前研究和使用最为广泛的透明导电氧化物薄膜材料,由于具有低电阻率、高可见光透过率、高红外反射率等独特物理特性而被大量应用于平板显示器、太阳能电池、发光二极管、气体传感器、飞机风挡玻璃除霜器等领域。此外,ITO薄膜对微波还具有高达85%的衰减作用,因而在电磁屏蔽等军用领域显示出巨大的潜在应用价值。过去几十年里,针对ITO薄膜的研究工作主要聚焦于薄膜的光电性能上。当前,伴随着ITO薄膜的应用范围在航空航天和军用武器装备等领域的拓展,ITO 薄膜在恶劣力学环境中的使用日渐增多。因此,除光电性能外,ITO 薄膜的力学性能也开始受到研究者越来越多的关注,人们对薄膜器件在各类恶劣使用环境中的稳定性及耐久性提出了更高的要求,这一要求使得对ITO薄膜力学性能的深入研究分析有了重要的理论及实际意义。本文综述了近年来ITO薄膜在微结构特性、能带结构、光电性能及力学性能等方面的研究进展,简略探讨了ITO薄膜的研究发展方向。%ITO is the abbreviation of tin doped indium oxide thin film, which belongs to the group of transparent conducting oxide materials. ITO thin films fabricated by conventional deposition methods show amorphous or body-centered cubic crystal structure ordinarily, and perform as n-type semiconductors, their carriers deriving from the donor impurities caused by the deviation of stoichiometric ratio and cation doping during film deposition. ITO thin film is the most widely applied and investigated transparent

  13. SEMICONDUCTOR MATERIALS Electrical and optical properties of deep ultraviolet transparent conductive Ga2O3/ITO films by magnetron sputtering

    Science.gov (United States)

    Jianjun, Liu; Jinliang, Yan; Liang, Shi; Ting, Li

    2010-10-01

    Ga2O3/ITO films were prepared by magnetron sputtering on quartz glass substrates. The transmittance and sheet resistance of ITO films and Ga2O3/ITO films were measured by using a double beam spectrophotometer and four point probes. The effect of the ITO layer and Ga2O3 layer thickness on the electrical and optical properties of Ga2O3/ITO bi-layer films were investigated in detail. Ga2O3 (50 nm)/ITO (23 nm) films exhibited a low sheet resistance of 323 Ω/□ and high deep ultraviolet transmittance of 77.6% at a wavelength of 280 nm. The ITO layer controls the ultraviolet transmittance and sheet resistance of Ga2O3/ITO films. The Ga2O3 layer thickness has a marked effect on the transmission spectral shape of Ga2O3/ITO films in the violet spectral region.

  14. Photocatalytic degradation of methyl orange over ITO/Cds/ZnO interface composite films.

    Science.gov (United States)

    Wei, Shouqiang; Shao, Zhongcai; Lu, Xudong; Liu, Ying; Cao, Linlin; He, Yan

    2009-01-01

    ITO/CdS/ZnO interface composite films were successfully prepared by subsequent electrodeposition of CdS and ZnO onto indium tin oxide (ITO) glass substrates. The obtained ITO/CdS/ZnO composite films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectroscopy. The photocatalytic activity of ITO/CdS/ZnO composite films were investigated using methyl orange (MO) as a model organic compound under UV light irradiation. The influence of operating parameters on MO degradation including initial concentration of MO, pH value of solution, and inorganic anion species over the composite films were examined. A blue shift of absorption threshold was observed for the ITO/CdS/ZnO film in comparison with ITO/ZnO film. ITO/CdS/ZnO composite films prepared under specific conditions showed a higher photocatalytic activity than that of ITO/ZnO films. It was also found that the photocatalytic degradation of MO on the composite films followed pseudo-first order kinetics.

  15. Merits and Demerits of Transparent Conducting Magnetron Sputtered ZnO:Al, ITO and SnO2:F Thin Films for Solar Cell Applications

    Science.gov (United States)

    Das, Rajesh; Das, Himadri Sekhar

    2017-04-01

    Transparent conducting ZnO:Al and indium tin oxide (ITO) thin films were deposited by magnetron sputtering under reactive environment. Both the transparent conducting oxide (TCO) films were exposed intentionally in hydrogen environment at 350 °C calcinations temperature to study the post treated TCO film's opto-electronic, structural as well as surface morphological properties. Electrical resistivity of both ZnO:Al, ITO and SnO2:F films are comparable (order of 10-4 Ω-cm), lowest sheet resistance are 8.5, 3.7 and 4.6 Ω/sq respectively and slightly improved after hydrogen exposure at 350 °C. Optical transmittance and internal texture of hydrogen environment exposed ZnO films remains invariant, but in case of ITO, SnO2:F films optical transmittance deteriorated drastically. Hexagonal wurtzite structure with (002) c-axis orientation is observed for pre- and post-hydrogen exposed ZnO films whereas internal texture as well as crystallographic orientation of ITO and SnO2:F films have significantly changed. Surface grains of ITO films have been significantly enhanced, but no such variations are observed in ZnO surface morphology. ZnO:Al and ITO films show unique plasmonic properties in near infrared transmittance due to free carrier generation in conduction band. Based on surface features/morphology, haze factor and internal texture light scattering mechanism is modeled.

  16. Photocatalytic degradation of methyl orange over ITO/CdS/ZnO interface composite films

    Institute of Scientific and Technical Information of China (English)

    WEI Shouqiang; SHAO Zhongcai; LU Xudong; LIU Ying; CAO Linlin; HE Yan

    2009-01-01

    ITO/CdS/ZnO interface composite films were successfully prepared by subsequent electrodeposition of CdS and ZnO onto indium tin oxide (ITO) glass substrates. The obtained ITO/CdS/ZnO composite films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectroscopy. The photocatalytic activity of ITO/CdS/ZnO composite films were investigated using methyl orange (MO) as a model organic compound under UV light irradiation. The influence of operating parameters on MO degradation including initial concentration of MO, pH value of solution, and inorganic anion species over the composite films were examined. A blue shift of absorption threshold was observed for the ITO/CdS/ZnO film in comparison with ITO/ZnO film. ITO/CdS/ZnO composite films prepared under specific conditions showed a higher photocatalytic activity than that of ITO/ZnO films. It was also found that the photocatalytic degradation of MO on the composite filing followed pseudo-first order kinetics.

  17. Effects of heat treatment on morphological, optical and electrical properties of ITO films by sol-gel technique

    Institute of Scientific and Technical Information of China (English)

    LI Zhi-hua; KE Yu-peng; REN Dong-yan

    2008-01-01

    Indium-tin-oxide(ITO) films were prepared on the quarts glass by sol-gel technique. Effects of different heat treatment temperatures and cooling methods on the morphological, optical and electrical properties of ITO films were measured by TG/DTA, IR, XRD, SEM, UV-VIS spectrometer and four-probe apparatus. It is found that the crystallized ITO films exhibit a polycrystalline cubic bixbyite structure. The heat treatment process has significant effects on the morphological, optical and electrical properties of ITO films. Elevating the heat treatment temperature can perfect the crystallization process of ITO films, therefore the optical and electrical properties of ITO films are improved. But the further increasing of heat treatment temperature results in the increment of ITO films' resistivity. Compared with ITO films elaborated by furnace cooling, those prepared through air cooling have following characteristics as obviously decreased crystalline size, deeply declined porosity, more compact micro-morphology, improved electrical property and slightly decreased optical transmission.

  18. Preparation of ITO transparent conductive film by sol-gel method

    Institute of Scientific and Technical Information of China (English)

    LI Zhi-hua; REN Dong-yan

    2006-01-01

    The ITO transparent conductive films were prepared on substrate of quartz glass by sol-gel method. The raw materials were nitrate indium, acetylacetone and the dopant of anhydrous chloride (SnCl4). The process from gel to crystalline film and the microstructure of the films were investigated by DTA-TG, XRD and SEM. The influence of preparation processes on the electricity performance of the films was also studied by four-probe apparatus. The results show that the crystallization process of ITO xerogel completes when the heat treatment temperature reaches 600 ℃. The ITO films possesses on vesicular structures accumulated by spherical particles, and both heat treatment temperature and cooling rate have important effects on the resistivity ofITO films.

  19. A simple two-step method to fabricate highly transparent ITO/polymer nanocomposite films

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Haitao [State Key Laboratory of Organic-Inorganic Composites, Beijing University of Chemical Technology, Beijing 100029 (China); Zeng, Xiaofei, E-mail: zengxf@mail.buct.edu.cn [State Key Laboratory of Organic-Inorganic Composites, Beijing University of Chemical Technology, Beijing 100029 (China); Kong, Xiangrong [State Key Laboratory of Organic-Inorganic Composites, Beijing University of Chemical Technology, Beijing 100029 (China); Bian, Shuguang [The High Technology Research and Development Center, The Ministry of Science and Technology, Beijing 100044 (China); Chen, Jianfeng [Research Center of the Ministry of Education for High Gravity Engineering and Technology, Beijing University of Chemical Technology, Beijing 100029 (China)

    2012-09-01

    Highlights: Black-Right-Pointing-Pointer A simple two-step method without further surface modification step was employed. Black-Right-Pointing-Pointer ITO nanoparticles were easily to be uniformly dispersed in polymer matrix. Black-Right-Pointing-Pointer ITO/polymer nanocomposite film had high transparency and UV/IR blocking properties. - Abstract: Transparent functional indium tin oxide (ITO)/polymer nanocomposite films were fabricated via a simple approach with two steps. Firstly, the functional monodisperse ITO nanoparticles were synthesized via a facile nonaqueous solvothermal method using bifunctional chemical agent (N-methyl-pyrrolidone, NMP) as the reaction solvent and surface modifier. Secondly, the ITO/acrylics polyurethane (PUA) nanocomposite films were fabricated by a simple sol-solution mixing method without any further surface modification step as often employed traditionally. Flower-like ITO nanoclusters with about 45 nm in diameter were mono-dispersed in ethyl acetate and each nanocluster was assembled by nearly spherical nanoparticles with primary size of 7-9 nm in diameter. The ITO nanoclusters exhibited an excellent dispersibility in polymer matrix of PUA, remaining their original size without any further agglomeration. When the loading content of ITO nanoclusters reached to 5 wt%, the transparent functional nanocomposite film featured a high transparency more than 85% in the visible light region (at 550 nm), meanwhile cutting off near-infrared radiation about 50% at 1500 nm and blocking UV ray about 45% at 350 nm. It could be potential for transparent functional coating materials applications.

  20. Improving Performance of CIGS Solar Cells by Annealing ITO Thin Films Electrodes

    Directory of Open Access Journals (Sweden)

    Chuan Lung Chuang

    2015-01-01

    Full Text Available Indium tin oxide (ITO thin films were grown on glass substrates by direct current (DC reactive magnetron sputtering at room temperature. Annealing at the optimal temperature can considerably improve the composition, structure, optical properties, and electrical properties of the ITO film. An ITO sample with a favorable crystalline structure was obtained by annealing in fixed oxygen/argon ratio of 0.03 at 400°C for 30 min. The carrier concentration, mobility, resistivity, band gap, transmission in the visible-light region, and transmission in the near-IR regions of the ITO sample were -1.6E+20 cm−3, 2.7E+01 cm2/Vs, 1.4E-03 Ohm-cm, 3.2 eV, 89.1%, and 94.7%, respectively. Thus, annealing improved the average transmissions (400–1200 nm of the ITO film by 16.36%. Moreover, annealing a copper-indium-gallium-diselenide (CIGS solar cell at 400°C for 30 min in air improved its efficiency by 18.75%. The characteristics of annealing ITO films importantly affect the structural, morphological, electrical, and optical properties of ITO films that are used in solar cells.

  1. Direct electrical contact of slanted ITO film on axial p-n junction silicon nanowire solar cells.

    Science.gov (United States)

    Lee, Ya-Ju; Yao, Yung-Chi; Yang, Chia-Hao

    2013-01-14

    A novel scheme of direct electrical contact on vertically aligned silicon nanowire (SiNW) axial p-n junction is demonstrated by means of oblique-angle deposition of slanted indium-tin-oxide (ITO) film for photovoltaic applications. The slanted ITO film exhibits an acceptable resistivity of 1.07 x 10⁻³Ω-cm underwent RTA treatment of T = 450°C, and the doping concentration and carrier mobility by Hall measurement amount to 3.7 x 10²⁰ cm⁻³ and 15.8 cm²/V-s, respectively, with an n-type doping polarity. Because of the shadowing effect provided by the SiNWs, the incident ITO vapor-flow is deposited preferentially on the top of SiNWs, which coalesces and eventually forms a nearly continuous film for the subsequent fabrication of grid electrode. Under AM 1.5 G normal illumination, our axial p-n junction SiNW solar cell exhibits an open circuit voltage of VOC = 0.56 V, and a short circuit current of JSC = 1.54 mA/cm² with a fill factor of FF = 30%, resulting in a total power conversion efficiency of PEC = 0.26%.

  2. Fabrication and structure characterization of ITO transparent conducting film by sol-gel technique

    Institute of Scientific and Technical Information of China (English)

    LI Zhi-hua; REN Dong-yan

    2007-01-01

    Using In(NO3)3-5H2O and acetylacetone as raw materials and anhydrous SnCl4 as dopant, the transparent conducting indium tin oxide(ITO) films were prepared by sol-gel and dip-coating technique. The phase transformation, structure properties and physical properties (sheet resistance and transmittance) of the films were investigated by DTA-TG, XRD, SEM, four-probe method and UV-Vis spectrometry. The results indicate that it is feasible to fabricate ITO films on the quartz substrates by sol-gel technique, and the ITO films are formed by accumulating of particles with the size of several decades of nanometers. The prepared ITO film has cubic bixbyite structure, and (111) is its preferred plane. After five-times dip-coating, the ITO film has a thickness less than 150 nm, a sheet resistance of 110 Ω/□, a resistivity of 1.65×10-3 Ω-cm and a transparency of 90%.

  3. Study of the functional properties of ITO grown by metalorganic chemical vapor deposition from different indium and tin precursors

    Energy Technology Data Exchange (ETDEWEB)

    Szkutnik, P.D., E-mail: pierre.szkutnik@cea.fr [LMGP, Laboratoire des Matériaux et du Génie Physique, 3 parvis Louis Néel, 38016 Grenoble cedex (France); Roussel, H. [LMGP, Laboratoire des Matériaux et du Génie Physique, 3 parvis Louis Néel, 38016 Grenoble cedex (France); Lahootun, V. [Fine Chemical Synthesis and Surface Science – FC3S, Air Liquide - R and D CRCD, 1 chemin de la porte des loges, 78354 Les-Loges-en-Josas (France); Mescot, X. [IMEP-LAHC Institut de la Microélectronique, Electromagnétisme, Photonique, Hyperfréquences UMR5130 CNRS - Grenoble INP, 3 parvis Louis Néel 38016 Grenoble (France); Weiss, F.; Jiménez, C. [LMGP, Laboratoire des Matériaux et du Génie Physique, 3 parvis Louis Néel, 38016 Grenoble cedex (France)

    2014-08-01

    Highlights: • Study of ITO layers obtained from three indium and two tin precursors by pulsed MOCVD. • Optimized tin doping depends on the tin chemical precursor. • Combination including acetyl acetonate ligand present the same characteristics. • Films elaborated between 350 and 700 °C with InMe2OtBu present a constant resistivity. - Abstract: Functional properties of tin doped indium oxide (ITO) layers grown by MOCVD from different indium and tin precursors are investigated. Selected indium precursors are In(acac){sub 3}, In(tmhd){sub 3} and InMe{sub 2}O{sup t}Bu, and tin precursors are DBTDA and Sn(acac){sub 2}. ITO layers are optically and electrically characterized to determine the better doping conditions. Differences in electrical properties of ITO layers are found when using InMe{sub 2}O{sup t}Bu, as compared to In(acac){sub 3} and to In(tmhd){sub 3}. The best films present a resistivity of 2.5 × 10{sup −4} Ω cm and a transmittance higher than 84% for high deposition temperatures (T ⩾ 600 °C). The nature of tin precursors modifies the optimal doping at which these characteristics are achieved. When doped by DBTDA optimal doping is 8 at.%, therefore close to the solubility limit of tin in In{sub 2}O{sub 3} matrix; but when using Sn(acac){sub 2}, or In(acac){sub 3}/DBTDA combination, best functional characteristics are obtained for the maximal doping content obtained, i.e. 2.5 at.%. For optimized conditions, the resistivity decreases when deposition temperature increases except when using the couple InMe{sub 2}O{sup t}Bu/DBTDA without oxygen addition during deposition. For this combination of precursors a resistivity of 1 × 10{sup −3} Ω cm is obtained at a deposition temperature of 350 °C and remains constant up to 600 °C. Only the films obtained from InMe{sub 2}O{sup t}Bu/DBTDA are crystalline state at a deposition temperature of 350 °C.

  4. Mechanical Properties of ZTO, ITO, and a-Si:H Multilayer Films for Flexible Thin Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Claudia Hengst

    2017-03-01

    Full Text Available The behavior of bi- and trilayer coating systems for flexible a-Si:H based solar cells consisting of a barrier, an electrode, and an absorption layer is studied under mechanical load. First, the film morphology, stress, Young’s modulus, and crack onset strain (COS were analyzed for single film coatings of various thickness on polyethylene terephthalate (PET substrates. In order to demonstrate the role of the microstructure of a single film on the mechanical behavior of the whole multilayer coating, two sets of InSnOx (indium tin oxide, ITO conductive coatings were prepared. Whereas a characteristic grain–subgrain structure was observed in ITO-1 films, grain growth was suppressed in ITO-2 films. ITO-1 bilayer coatings showed two-step failure under tensile load with cracks propagating along the ITO-1/a-Si:H-interface, whereas channeling cracks in comparable bi- and trilayers based on amorphous ITO-2 run through all constituent layers. A two-step failure is preferable from an application point of view, as it may lead to only a degradation of the performance instead of the ultimate failure of the device. Hence, the results demonstrate the importance of a fine-tuning of film microstructure not only for excellent electrical properties, but also for a high mechanical performance of flexible devices (e.g., a-Si:H based solar cells during fabrication in a roll-to-roll process or under service.

  5. Mechanical Properties of ZTO, ITO, and a-Si:H Multilayer Films for Flexible Thin Film Solar Cells

    Science.gov (United States)

    Hengst, Claudia; Menzel, Siegfried B; Rane, Gayatri K; Smirnov, Vladimir; Wilken, Karen; Leszczynska, Barbara; Fischer, Dustin; Prager, Nicole

    2017-01-01

    The behavior of bi- and trilayer coating systems for flexible a-Si:H based solar cells consisting of a barrier, an electrode, and an absorption layer is studied under mechanical load. First, the film morphology, stress, Young’s modulus, and crack onset strain (COS) were analyzed for single film coatings of various thickness on polyethylene terephthalate (PET) substrates. In order to demonstrate the role of the microstructure of a single film on the mechanical behavior of the whole multilayer coating, two sets of InSnOx (indium tin oxide, ITO) conductive coatings were prepared. Whereas a characteristic grain–subgrain structure was observed in ITO-1 films, grain growth was suppressed in ITO-2 films. ITO-1 bilayer coatings showed two-step failure under tensile load with cracks propagating along the ITO-1/a-Si:H-interface, whereas channeling cracks in comparable bi- and trilayers based on amorphous ITO-2 run through all constituent layers. A two-step failure is preferable from an application point of view, as it may lead to only a degradation of the performance instead of the ultimate failure of the device. Hence, the results demonstrate the importance of a fine-tuning of film microstructure not only for excellent electrical properties, but also for a high mechanical performance of flexible devices (e.g., a-Si:H based solar cells) during fabrication in a roll-to-roll process or under service. PMID:28772609

  6. A simple two-step method to fabricate highly transparent ITO/polymer nanocomposite films

    Science.gov (United States)

    Liu, Haitao; Zeng, Xiaofei; Kong, Xiangrong; Bian, Shuguang; Chen, Jianfeng

    2012-09-01

    Transparent functional indium tin oxide (ITO)/polymer nanocomposite films were fabricated via a simple approach with two steps. Firstly, the functional monodisperse ITO nanoparticles were synthesized via a facile nonaqueous solvothermal method using bifunctional chemical agent (N-methyl-pyrrolidone, NMP) as the reaction solvent and surface modifier. Secondly, the ITO/acrylics polyurethane (PUA) nanocomposite films were fabricated by a simple sol-solution mixing method without any further surface modification step as often employed traditionally. Flower-like ITO nanoclusters with about 45 nm in diameter were mono-dispersed in ethyl acetate and each nanocluster was assembled by nearly spherical nanoparticles with primary size of 7-9 nm in diameter. The ITO nanoclusters exhibited an excellent dispersibility in polymer matrix of PUA, remaining their original size without any further agglomeration. When the loading content of ITO nanoclusters reached to 5 wt%, the transparent functional nanocomposite film featured a high transparency more than 85% in the visible light region (at 550 nm), meanwhile cutting off near-infrared radiation about 50% at 1500 nm and blocking UV ray about 45% at 350 nm. It could be potential for transparent functional coating materials applications.

  7. Application of indium tin oxide (ITO) thin film as a low emissivity film on Ni-based alloy at high temperature

    Science.gov (United States)

    Sun, Kewei; Zhou, Wancheng; Tang, Xiufeng; Luo, Fa

    2016-09-01

    Indium tin oxide (ITO) films as the low emissivity coatings of Ni-based alloy at high temperature were studies. ITO films were deposited on the polished surface of alloy K424 by direct current magnetron sputtering. These ITO-coated samples were heat-treated in air at 600-900 °C for 150 h to explore the effect of high temperature environment on the emissivity. The samples were analyzed by X-ray diffraction (XRD), SEM and EDS. The results show that the surface of sample is integrity after heat processing at 700 °C and below it. A small amount of fine crack is observed on the surface of sample heated at 800 °C and Ti oxide appears. There are lots of fine cracks on the sample annealed at 900 °C and a large number of various oxides are detected. The average infrared emissivities at 3-5 μm and 8-14 μm wavebands were tested by an infrared emissivity measurement instrument. The results show the emissivity of the sample after annealed at 600 and 700 °C is still kept at a low value as the sample before annealed. The ITO film can be used as a low emissivity coating of super alloy K424 up to 700 °C.

  8. In situ Crystallization of RF sputtered ITO thin films: A comparison with annealed samples

    Energy Technology Data Exchange (ETDEWEB)

    John, K. Aijo [Junior research Fellow, Sree Sankara College, Kalady, Ernakulam - 683 574, Kerala (India); Manju, T. [Assistant Professor, Department of Physics, Sree Sankara College, Kalady, Ernakulam - 683 574, Kerala (India)

    2014-01-28

    Tin doped Indium Oxide (ITO) is a wide band gap semiconductor with high conductivity and transparency in the visible region of the solar spectrum. One of the most popular and exploited applications of ITO is the realization of the transparent conductive layers needed for the electrodes of light sensitive devices, such as photovoltaic cells. The thermal energy for the crystallization of ITO films is very low (150°C). The crystallization can be achieved by the continuous energetic bombardment of the ions in the sputtering chamber without annealing or substrate heating. The accumulated energy will ensure the thermal energy necessary for the crystallization. With the help of sufficiently high sputtering power and sufficient duration, crystallized ITO films can be produced without annealing. In this report, a comparison of the conductivity and transparency of ITO films under two crystallization conditions ((1) crystallization of the sputtered films by annealing; (2) in situ crystallization of the films by providing high sputtering power and long sputtering duration) will be presented.

  9. Fabrication of ITO/Ag3SbS3/CdX (X = S, Se) thin film heterojunctions for photo-sensing applications

    Science.gov (United States)

    Daniel, T.; Henry, J.; Mohanraj, K.; Sivakumar, G.

    2016-11-01

    Thin film heterojunctions of Ag3SbS3/CdX (X = S, Se) are deposited on a glass substrate coated with SnO2:In (ITO). The films were characterized by x-ray diffraction (XRD), atomic force microscopy (AFM), UV-visible spectroscopy, photoluminescence spectroscopy, field emission scanning electron microscopy and I-V analysis. XRD reveals the monoclinic structure of Ag3SbS3 and a fcc structure for both CdS and CdSe thin films. The AFM images clearly show the distinct morphological features (nanopyramids, wedge-shaped and rectangular nanorod-like grains). From the I-V studies, under illumination, an ITO/Ag3SbS3/CdS heterojunction produces a higher photocurrent (12.4 mA) than that an ITO/Ag3SbS3/CdSe heterojunction (1.34 mA).

  10. Ionization potentials of transparent conductive indium tin oxide films covered with a single layer of fluorine-doped tin oxide nanoparticles grown by spray pyrolysis deposition

    OpenAIRE

    2005-01-01

    Indium tin oxide (ITO) films deposited with single layers of monodispersive fluorine-doped tin oxide (FTO) nanoparticles of several nanometers in size were grown on glass substrates by intermittent spray pyrolysis deposition using conventional atomizers. These films have significantly higher ionization potentials than the bare ITO and FTO films grown using the same technique. The ITO films covered with FTO particles of 7 nm in average size show an ionization potential of 5.01 eV, as compared ...

  11. TiO2 Thin Film UV Detectors Deposited by DC Reactive Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHANG Li-wei; YAO Ning; ZHANG Bing-lin; FAN Zhi-qin; YANG Shi-e; LU Zhan-ling

    2004-01-01

    Crystalline TiO2 thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposited on quartz substrate, the photoconductive UV detector on TiO2 thin films was based on a sandwich structure of C/ TiO2/ITO. The measurement of the I-V characteristics for these devices shows good ohmic contact. The photoresponse of TiO2 thin films was analyzed at different bias voltage. Voltage.

  12. Biomimetic thin film deposition

    Science.gov (United States)

    Rieke, P. C.; Campbell, A. A.; Tarasevich, B. J.; Fryxell, G. E.; Bentjen, S. B.

    1991-04-01

    Surfaces derivatized with organic functional groups were used to promote the deposition of thin films of inorganic minerals. These derivatized surfaces were designed to mimic the nucleation proteins that control mineral deposition during formation of bone, shell, and other hard tissues in living organisms. By the use of derivatized substrates control was obtained over the phase of mineral deposited, the orientation of the crystal lattice and the location of deposition. These features are of considerable importance in many technically important thin films, coatings, and composite materials. Methods of derivatizing surfaces are considered and examples of controlled mineral deposition are presented.

  13. Study of low resistivity and high work function ITO films prepared by oxygen flow rates and N2O plasma treatment for amorphous/crystalline silicon heterojunction solar cells.

    Science.gov (United States)

    Hussain, Shahzada Qamar; Oh, Woong-Kyo; Kim, Sunbo; Ahn, Shihyun; Le, Anh Huy Tuan; Park, Hyeongsik; Lee, Youngseok; Dao, Vinh Ai; Velumani, S; Yi, Junsin

    2014-12-01

    Pulsed DC magnetron sputtered indium tin oxide (ITO) films deposited on glass substrates with lowest resistivity of 2.62 x 10(-4) Ω x cm and high transmittance of about 89% in the visible wavelength region. We report the enhancement of ITO work function (Φ(ITO)) by the variation of oxygen (O2) flow rate and N2O surface plasma treatment. The Φ(ITO) increased from 4.43 to 4.56 eV with the increase in O2 flow rate from 0 to 4 sccm while surface treatment of N2O plasma further enhanced the ITO work function to 4.65 eV. The crystallinity of the ITO films improved with increasing O2 flow rate, as revealed by XRD analysis. The ITO work function was increased by the interfacial dipole resulting from the surface rich in O- ions and by the dipole moment formed at the ITO surface during N2O plasma treatment. The ITO films with high work functions can be used to modify the front barrier height in heterojunction with intrinsic thin layer (HIT) solar cells.

  14. Study of indium tin oxide thin films deposited on acrylics substrates by Ion beam assisted deposition technique

    OpenAIRE

    Meng Lijian; Liang Erjun; Gao Jinsong; Teixeira, Vasco M. P.; Santos, M. P. dos

    2009-01-01

    Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the ...

  15. ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Loebl, H.P. [Philips Res. Labs., Aachen (Germany); Huppertz, M. [Philips Res. Labs., Aachen (Germany); Mergel, D. [University GH Essen, Fachbereich 7, Physik, D-45117, Essen (Germany)

    1996-07-01

    A reactive d.c. magnetron sputtering process with relatively high oxygen flow suitable for antireflective and antistatic (ARAS) coatings on display tubes is described. The sputtering conditions and their influence on optical, structural and electrical properties of indium tin oxide (ITO) films are discussed and compared with other ITO sputtering processes from a metallic target. Emphasis is placed on the relation between microstructure, defect structure and conductivity, and on the determination of the optimal process conditions for obtaining fine-grained films for optical applications that can withstand the 460 C heat treatment during tube assembly. As an example, a simple three-layer broadband ARAS coating is investigated, consisting of a transparent conductive ITO layer, a TiO{sub 2} layer and a SiO{sub 2} layer on top. (orig.)

  16. In Situ Synthesis and Deposition of Gold Nanoparticles with Different Morphologies on Glass and ITO Substrate by Ultrasonic Spray Pyrolysis

    OpenAIRE

    María de la Garza; Israel López; Idalia Gómez

    2013-01-01

    Gold nanoparticles were synthesized and deposited in situ by ultrasonic spray pyrolysis on glass and indium tin oxide (ITO) substrates. This technique led to the formation of gold nanoparticles with different morphologies without the use of any capping agent. The gold nanoparticles deposited on glass substrate were obtained as nanospheres with an average particle size of 30 nm with some agglomerates; however, the nanoparticles deposited on ITO substrate were obtained with different morphologi...

  17. ITO spin-coated porous silicon structures

    Energy Technology Data Exchange (ETDEWEB)

    Daoudi, K.; Sandu, C.S.; Moadhen, A.; Ghica, C.; Canut, B.; Teodorescu, V.S.; Blanchin, M.G.; Roger, J.A.; Oueslati, M.; Bessaies, B

    2003-08-15

    Porous silicon (PS)-based structures were formed by deposition of an indium tin oxide (ITO) onto PS surface using the sol-gel spin coating route. Two types of thermal annealing processes, classical and rapid thermal annealing, were used in order to crystallise the ITO films. The initial photoluminescence of the PS layers is partly preserved. The morphology of ITO/PS structure was investigated by cross-sectional transmission electron microscopy (XTEM) and by Rutherford backscattering spectrometry (RBS) measurements.

  18. Synthesis and morphological modification of semiconducting Mg(Zn)Al(Ga)–LDH/ITO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Valente, Jaime S., E-mail: jsanchez@imp.mx [Instituto Mexicano del Petróleo, Eje Central # 152, 07730 México D.F. (Mexico); López-Salinas, Esteban [Instituto Mexicano del Petróleo, Eje Central # 152, 07730 México D.F. (Mexico); Prince, Julia [Universidad Anáhuac México Norte, Av. Universidad Anáhuac # 46, Huixquilucan, Edo. de México 52786 (Mexico); González, Ignacio; Acevedo-Peña, Prospero [Universidad Autónoma Metropolitana-Iztapalapa, Departamento de Química, Apdo. Postal 55-534, 09340 México D.F. (Mexico); Ángel, Paz del [Instituto Mexicano del Petróleo, Eje Central # 152, 07730 México D.F. (Mexico)

    2014-09-15

    Layered double hydroxide (LDH) thin films with different chemical compositions (MgZnAl, MgZnGa, MgGaAl) and varying thicknesses were easily prepared by sol–gel method followed by dip-coating. Films were chemically uniform, transparent and well adhered to a conductive indium tin oxide (ITO) substrate. Structure, chemical composition and morphology of the thin films were characterized by XRD-GADDS, SEM-EDS and AFM. Additionally, the semiconducting properties of all the prepared films were studied through the Mott–Schottky relationship; such properties were closely related to the chemical compositions of the film. The films were characterized after electrochemical treatment and important modifications regarding surface morphology, particle and crystal sizes were observed. An in-depth study was conducted in order to investigate the effect of several different electrochemical treatments on the morphology, particle size distribution and crystal size of LDH thin films. Upon electrochemical treatment, the films' surface became smooth and the particles forming the films were transformed from flaky open LDH platelets to uniformly distributed close-packed LDH nanoparticles. - Highlights: • Semiconducting Mg(Zn)Al(Ga)–LDH/ITO thin films prepared by sol–gel. • LDH thin films show a turbostratic morphology made up of porous flakes. • Electrochemical treatments change the flaky structure into a nanoparticle array.

  19. ITO-Free Semitransparent Organic Solar Cells Based on Silver Thin Film Electrodes

    Directory of Open Access Journals (Sweden)

    Zhizhe Wang

    2014-01-01

    Full Text Available ITO-free semitransparent organic solar cells (OSCs based on MoO3/Ag anodes with poly(3-hexylthiophene and [6,6]-phenyl-C61-butyric acid methyl ester films as the active layer are investigated in this work. To obtain the optimal transparent (MoO3/Ag anode, ITO-free reference OSCs are firstly fabricated. The power conversion efficiency (PCE of 2.71% is obtained for OSCs based on the optimal MoO3 (2 nm/Ag (9 nm anode, comparable to that of ITO-based reference OSCs (PCE of 2.85%. Then based on MoO3 (2 nm/Ag (9 nm anode, ITO-free semitransparent OSCs with different thickness combination of Ca and Ag as the cathodes are investigated. It is observed from our results that OSCs with Ca (15 nm/Ag (15 nm cathode have the optimal transparency. Meanwhile, the PCE of 1.79% and 0.67% is obtained for illumination from the anode and cathode side, respectively, comparable to that of similar ITO-based semitransparent OSCs (PCE of 1.59% and 0.75% for illumination from the anode and cathode side, resp. (Sol. Energy Mater. Sol. Cells, 95, pp. 877–880, 2011. The transparency and PCE of ITO-free semitransparent OSCs can be further improved by introducing a light couple layer. The developed method is compatible with various substrates, which is instructive for further research of ITO-free semitransparent OSCs.

  20. Effect of the cathodic polarization on structural and morphological proprieties of FTO and ITO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Cid, C.C. Plá [LabSiN, Departamento de Física, Universidade Federal de Santa Catarina, Caixa Postal 476, 88040-900 Florianópolis, SC (Brazil); Spada, E.R., E-mail: edspada@gmail.com [LabSiN, Departamento de Física, Universidade Federal de Santa Catarina, Caixa Postal 476, 88040-900 Florianópolis, SC (Brazil); Instituto de Física de São Carlos, Universidade de São Paulo, Caixa Postal 369, 13560-970 São Carlos, SP (Brazil); Sartorelli, M.L. [LabSiN, Departamento de Física, Universidade Federal de Santa Catarina, Caixa Postal 476, 88040-900 Florianópolis, SC (Brazil)

    2013-05-15

    This paper deals on the influence of the potentiodynamic stress on structural and morphological proprieties of fluorine-doped tin oxide (FTO, SnO{sub 2}:F) and indium tin oxide (ITO, In{sub 2}O{sub 3}:Sn) commercial substrates. The potential range is between 0.0 and −2.0 (V/SCE) using an electrolyte with neutral pH. The electrochemical behavior was investigated from cyclic voltammetry technique and chronopotentiometric curves. These electrochemical results were associated to the X-ray diffraction (XRD) spectra and morphology images acquired by scanning electron microscopy (SEM). The main results show that structural and morphological properties of FTO substrates after cathodic polarization remain near constant when compared with ITO films. The ITO substrates show morphological changes after treatment and the XRD patterns indicate the formation of a crystalline structure with In metallic characteristic, at neutral pH.

  1. Biomimetic thin film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Rieke, P.R.; Graff, G.E.; Campbell, A.A.; Bunker, B.C.; Baskaran, S.; Song, L.; Tarasevich, B.J.; Fryxell, G.E.

    1995-09-01

    Biological mineral deposition for the formation of bone, mollusk shell and other hard tissues provides materials scientists with illustrative materials processing strategies. This presentation will review the key features of biomineralization and how these features can be of technical importance. We have adapted existing knowledge of biomineralization to develop a unique method of depositing inorganic thin films and coating. Our approach to thin film deposition is to modify substrate surfaces to imitate the proteins found in nature that are responsible for controlling mineral deposition. These biomimetic surfaces control the nucleation and growth of the mineral from a supersaturated aqueous solution. This has many processing advantages including simple processing equipment, environmentally benign reagents, uniform coating of highly complex shapes, and enhanced adherence of coating. Many different types of metal oxide, hydroxide, sulfide and phosphate materials with useful mechanical, optical, electronic and biomedical properties can be deposited.

  2. Metal-insulator transition in tin doped indium oxide (ITO) thin films: Quantum correction to the electrical conductivity

    Science.gov (United States)

    Kaushik, Deepak Kumar; Kumar, K. Uday; Subrahmanyam, A.

    2017-01-01

    Tin doped indium oxide (ITO) thin films are being used extensively as transparent conductors in several applications. In the present communication, we report the electrical transport in DC magnetron sputtered ITO thin films (prepared at 300 K and subsequently annealed at 673 K in vacuum for 60 minutes) in low temperatures (25-300 K). The low temperature Hall effect and resistivity measurements reveal that the ITO thin films are moderately dis-ordered (kFl˜1; kF is the Fermi wave vector and l is the electron mean free path) and degenerate semiconductors. The transport of charge carriers (electrons) in these disordered ITO thin films takes place via the de-localized states. The disorder effects lead to the well-known `metal-insulator transition' (MIT) which is observed at 110 K in these ITO thin films. The MIT in ITO thin films is explained by the quantum correction to the conductivity (QCC); this approach is based on the inclusion of quantum-mechanical interference effects in Boltzmann's expression of the conductivity of the disordered systems. The insulating behaviour observed in ITO thin films below the MIT temperature is attributed to the combined effect of the weak localization and the electron-electron interactions.

  3. Optical monitoring of thin film electro-polymerization on surface of ITO-coated lossy-mode resonance sensor

    Science.gov (United States)

    Sobaszek, Michał; Dominik, Magdalena; Burnat, Dariusz; Bogdanowicz, Robert; Stranak, Viteszlav; Sezemsky, Petr; Śmietana, Mateusz

    2017-04-01

    This work presents an optical fiber sensors based on lossy-mode resonance (LMR) phenomenon supported by indium tin oxide (ITO) thin overlay for investigation of electro-polymerization effect on ITO's surface. The ITO overlays were deposited on core of polymer-clad silica (PCS) fibers using reactive magnetron sputtering (RMS) method. Since ITO is electrically conductive and electrochemically active it can be used as a working electrode in 3-electrode cyclic voltammetry setup. For fixed potential applied to the electrode current flow decrease with time what corresponds to polymer layer formation on the ITO surface. Since LMR phenomenon depends on optical properties in proximity of the ITO surface, polymer layer formation can be monitored optically in real time. The electrodeposition process has been performed with Isatin which is a strong endogenous neurochemical regulator in humans as it is a metabolic derivative of adrenaline. It was found that optical detection of Isatin is possible in the proposed configuration.

  4. Combustion synthesized indium-tin-oxide (ITO) thin film for source/drain electrodes in all solution-processed oxide thin-film transistors

    Science.gov (United States)

    Tue, Phan Trong; Inoue, Satoshi; Takamura, Yuzuru; Shimoda, Tatsuya

    2016-06-01

    We report combustion solution synthesized (SCS) indium-tin-oxide (ITO) thin film, which is a well-known transparent conductive oxide, for source/drain (S/D) electrodes in solution-processed amorphous zirconium-indium-zinc-oxide TFT. A redox-based combustion synthetic approach is applied to ITO thin film using acetylacetone as a fuel and metal nitrate as oxidizer. The structural and electrical properties of SCS-ITO precursor solution and thin films were systematically investigated with changes in tin concentration, indium metal precursors, and annealing conditions such as temperature, time, and ambient. It was found that at optimal conditions the SCS-ITO thin film exhibited high crystalline quality, atomically smooth surface (RMS ~ 4.1 Å), and low electrical resistivity (4.2 × 10-4 Ω cm). The TFT using SCS-ITO film as the S/D electrodes showed excellent electrical properties with negligible hysteresis. The obtained "on/off" current ratio, subthreshold swing factor, subthreshold voltage, and field-effect mobility were 5 × 107, 0.43 V/decade, 0.7 V, and 2.1 cm2/V s, respectively. The performance and stability of the SCS-ITO TFT are comparable to those of the sputtered-ITO TFT, emphasizing that the SCS-ITO film is a promising candidate for totally solution-processed oxide TFTs.

  5. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    OpenAIRE

    Zulkarnain Zainal; Mohd Norizam Md Daud; Azmi Zakaria; Mohd Sabri Mohd Ghazali; Atefeh Jafari; Wan Rafizah Wan Abdullah

    2012-01-01

    CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111) orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the ...

  6. ITO films realized at room-temperature by ion beam sputtering for high-performance flexible organic light-emitting diodes

    Energy Technology Data Exchange (ETDEWEB)

    Lucas, B.; Rammal, W.; Moliton, A. [Limoges Univ., Faculte des Sciences et Techniques, CNRS, UMR 6172, Institut de Recherche XLIM, Dept. MINACOM, 87 - Limoges (France)

    2006-06-15

    Indium-tin oxide (ITO) thin layers are obtained by an IBS (Ion Beam Sputtering) deposition process. We elaborated ITO films on flexible substrates of polyethylene terephthalate (PET), under soft conditions of low temperatures and fulfilling the requirements of fabrication processes of the organic optoelectronic components. With a non thermally activated (20 Celsius degrees) ITO deposition assisted by an oxygen flow (1 cm{sup 3}/min), we got an optical transmittance of 90% in the visible range, a resistivity around 10{sup -3} {omega}.cm and a surface roughness lower than 1.5 mm. Thus we realized flexible organic light-emitting diodes (FOLEDs) with good performances: a maximum luminance of 12000 cd/m{sup 2} at a voltage of 19 V and a maximum luminous power efficiency around 1 lm/W at a voltage of 10 V (or a maximum current efficiency of 4 cd/A at 14 V) for the (PET(50 {mu}m) / ITO(200 nm) / TPD(40 nm) / Alq3(60 nm) / Ca / Al) structure. (authors)

  7. Three-dimensional electrodes for dye-sensitized solar cells: synthesis of indium-tin-oxide nanowire arrays and ITO/TiO2 core-shell nanowire arrays by electrophoretic deposition.

    Science.gov (United States)

    Wang, Hong-Wen; Ting, Chi-Feng; Hung, Miao-Ken; Chiou, Chwei-Huann; Liu, Ying-Ling; Liu, Zongwen; Ratinac, Kyle R; Ringer, Simon P

    2009-02-04

    Dye-sensitized solar cells (DSSCs) show promise as a cheaper alternative to silicon-based photovoltaics for specialized applications, provided conversion efficiency can be maximized and production costs minimized. This study demonstrates that arrays of nanowires can be formed by wet-chemical methods for use as three-dimensional (3D) electrodes in DSSCs, thereby improving photoelectric conversion efficiency. Two approaches were employed to create the arrays of ITO (indium-tin-oxide) nanowires or arrays of ITO/TiO(2) core-shell nanowires; both methods were based on electrophoretic deposition (EPD) within a polycarbonate template. The 3D electrodes for solar cells were constructed by using a doctor-blade for coating TiO(2) layers onto the ITO or ITO/TiO(2) nanowire arrays. A photoelectric conversion efficiency as high as 4.3% was achieved in the DSSCs made from ITO nanowires; this performance was better than that of ITO/TiO(2) core-shell nanowires or pristine TiO(2) films. Cyclic voltammetry confirmed that the reaction current was significantly enhanced when a 3D ITO-nanowire electrode was used. Better separation of charge carriers and improved charge transport, due to the enlarged interfacial area, are thought to be the major advantages of using 3D nanowire electrodes for the optimization of DSSCs.

  8. Characterization of CdTe films deposited at various bath temperatures and concentrations using electrophoretic deposition.

    Science.gov (United States)

    Daud, Mohd Norizam Md; Zakaria, Azmi; Jafari, Atefeh; Ghazali, Mohd Sabri Mohd; Abdullah, Wan Rafizah Wan; Zainal, Zulkarnain

    2012-01-01

    CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111) orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the CdTe film increased with the increase of CdTe concentration. The optical energy band gap of film decreased with the increase of CdTe concentration, and with the increase of isothermal bath temperature. The film thickness increased with respect to the increase of CdTe concentration and bath temperature, and following, the numerical expression for the film thickness with respect to these two variables has been established.

  9. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    Zulkarnain Zainal

    2012-05-01

    Full Text Available CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111 orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the CdTe film increased with the increase of CdTe concentration. The optical energy band gap of film decreased with the increase of CdTe concentration, and with the increase of isothermal bath temperature. The film thickness increased with respect to the increase of CdTe concentration and bath temperature, and following, the numerical expression for the film thickness with respect to these two variables has been established.

  10. The effects of sodium in ITO by pulsed laser deposition on organic light-emitting diodes

    Energy Technology Data Exchange (ETDEWEB)

    Yong, Thian Khok [Multimedia University, Faculty of Engineering, Cyberjaya, Selangor (Malaysia); Universiti Tunku Abdul Rahman, Faculty of Engineering and Science, Kuala Lumpur (Malaysia); Kee, Yeh Yee; Tan, Sek Sean; Siew, Wee Ong; Tou, Teck Yong [Multimedia University, Faculty of Engineering, Cyberjaya, Selangor (Malaysia); Yap, Seong Shan [Multimedia University, Faculty of Engineering, Cyberjaya, Selangor (Malaysia); Norwegian University of Science and Technology, Department of Physics, Trondheim (Norway)

    2010-12-15

    The depth profile of ITO on glass was measured by the time-of-flight secondary ion mass spectroscopy (TOFSIMS) which revealed high sodium (Na) ion concentration at the ITO surface as well as at the ITO-glass interface as a result of out diffusion with substrate heating. Effects of Na ions on the performance of organic light-emitting diode (OLED) were studied by etching away a few tens of nanometers off the ITO surface with a dilute aquaregia solution of HNO{sub 3}:HCl:H{sub 2}O. A single-layer, molecularly doped ITO/(PVK+TPD+Alq{sub 3})/Al OLEDs were fabricated on bare and etched ITO samples. Although the removal of a 10-nm layer of ITO surface increased the voltage range, brightness, and lifetime, it was insufficient to correlate these improvements with solely to the Na ion reduction without considering the surface roughness. (orig.)

  11. Ultra-low thermal conductivity of nanogranular indium tin oxide films deposited by spray pyrolysis

    Science.gov (United States)

    Brinzari, Vladimir I.; Cocemasov, Alexandr I.; Nika, Denis L.; Korotcenkov, Ghenadii S.

    2017-02-01

    The authors have shown that nanogranular indium tin oxide (ITO) films, deposited by spray pyrolysis on a silicon substrate, demonstrate ultralow thermal conductivity κ ˜ 0.84 ± 0.12 Wm-1 K-1 at room temperature. This value is approximately by one order of magnitude lower than that in bulk ITO. The strong drop of thermal conductivity is explained by the nanogranular structure and porosity of ITO films, resulting in enhanced phonon scattering on grain boundaries. The experimental results were interpreted theoretically, employing the Boltzmann transport equation approach for phonon transport and filtering model for electronic transport. The calculated values of thermal conductivity are in reasonable agreement with the experimental findings. The presented results show that ITO films with an optimal nanogranular structure may be prospective for thermoelectric applications.

  12. Effects of SiO_2 and TiO_2 on resistance stabilities of flexible indium-tin-oxide films prepared by ion assisted deposition

    Institute of Scientific and Technical Information of China (English)

    LI Yuqiong; YU Zhinong; WANG Wuyu; FAN Yuejiang; DING Zhao; XUE Wei

    2009-01-01

    Inorganic buffer layers such as SiO_2 or TiO_2 and transparent conductive indium-tin-oxide (ITO) films were prepared on polyethylene terephthalate (PET) substrates by ion assisted deposition (LAD) at room temperature, and the effects of SiO_2 and TiO_2 on the bending resis-tance performance of flexible ITO films were investigated. The results show that ITO films with SiO_2 or TiO_2 buffer layer have better resis-tance stabihties compared to ones without the buffer layer when the ITO films are inwards bent at a bending radius more than 1.2 cm and when the ITO films are outwards bent at a bending radius from 0.8 cm to 1.2 cm. ITO films with SiO_2 buffer layer have better resistance sta-bilities compared to ones with TiO_2 buffer layer after the ITO Films are bent several hundreds of cycles at the same bending radius, for the adhesion of SiO_2 is stronger than that of TiO_2. The compressive stress resulted from inward bending leads to the formation of more defects in the ITO films compared with the tensile stress arising from outward bending. SiO_2 and TiO_2 buffer layers can effectively improve the crystal-linity of ITO films in (400), (440) directions.

  13. Modification of erbium photoluminescence decay rate due to ITO layers on thin films of SiO{sub 2}:Er doped with Si-nanoclusters

    Energy Technology Data Exchange (ETDEWEB)

    Wojdak, M., E-mail: m.wojdak@ucl.ac.uk [Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE (United Kingdom); Jayatilleka, H. [Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE (United Kingdom); Department of Electrical and Computer Engineering, University of Toronto, 10 King' s College Road, Toronto, Ontario, Canada M5S 3G4 (Canada); Shah, M. [Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE (United Kingdom); Kenyon, A.J., E-mail: t.kenyon@ucl.ac.uk [Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE (United Kingdom); Gourbilleau, F.; Rizk, R. [Centre de Recherche sur les Ions, les Matériaux et la Photonique (CIMAP), ENSICAEN, CNRS, CEA/IRAMIS, Université de Caen, 14050 CAEN cedex (France)

    2013-04-15

    During the fabrication of MOS light emitting devices, the thin film of active material is usually characterized by photoluminescence measurements before electrical contacts are deposited. However, the presence of a conductive contact layer can alter the luminescent properties of the active material. The local optical density of states changes due to the proximity of luminescent species to the interface with the conductive medium (the top electrode), and this modifies the radiative rate of luminescent centers within the active layer. In this paper we report enhancement of the observed erbium photoluminescence rate after deposition of indium tin oxide contacts on thin films of SiO{sub 2}:Er containing silicon nanoclusters, and relate this to Purcell enhancement of the erbium radiative rate. -- Highlights: ► We studied photoluminescence of Er in SiO{sub 2} thin films doped with Si nanoclusters. ► Presence of ITO layer on the top enhances photoluminescence decay rate of Er. ► The effect depends on the thickness of active film. ► Radiative rate change in proximity of ITO layer was calculated theoretically. ► The calculation results are compared with the experiment and discussed.

  14. Plasma treatment of ITO films for the formation of nanoparticles toward scalable production of novel nanostructure-based solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Cigang; Bailey, Louise R.; Proudfoot, Gary; Cooke, Mike [Oxford Instruments Plasma Technology, Bristol (United Kingdom); Eisenhawer, Bjoern; Jia, Guobin; Bergmann, Joachim; Falk, Fritz [Leibniz Institute of Photonic Technology, Jena (Germany); Ulyashin, Alexander [Department of Industrial Processes, SINTEF, Oslo (Norway)

    2015-01-01

    Plasma treatment of indium tin oxide (ITO) has been studied to form metallic nanoparticles (NPs) for nanostructure-based solar cells. It is demonstrated that NPs can be formed at temperatures as low as 100 C, and the size of NPs increases with temperature. An ITO layer treated at 100 C has higher transmission than that treated at 200 C for the same time. It is suggested that such NPs can be used for the conversion efficiency enhancement of ITO/Si heterojunction solar cells. It is also shown that NPs can be produced on different substrates covered by an ITO layer, such as ITO/Al foil, ITO/glass, ITO/stainless steel, and ITO/Si, where the resulting NPs were used for catalytic growth of Si nanowires (NWs). The morphology and density of Si NWs depend on a substrate. It is established that p-doped Si NWs show larger diameters, and n-doped Si NWs do not show obvious change of diameters compared to undoped Si NWs. New types of solar cell structures with combined radial and axial junctions have been proposed. As an example, p-n junction-based 3D structures using the NPs obtained from treatment of ITO film are presented. Finally, a potentially scalable process flow for fabrication of nanostructure-based solar cells is discussed. Schematic illustration of fabrication steps to produce the proposed novel solar cell with combined radial and axial junctions. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. Preparation and properties of all-solid-state inorganic thin film glass/ITO/WO3/LiNbO3/NiOx/ITO electrochromic device

    Science.gov (United States)

    Wu, Zhonghou; Diao, Xungang; Dong, Guobo

    2016-01-01

    The all-thin-film inorganic electrochromic device (ECD) with LiNbO3 as the ion conductor layer was prepared. The ECD was fabricated monolithically in a same vacuum chamber layer by layer using DC reactive sputtering for WO3, NiOx and ITO, and radio frequency (RF) sputtering for LiNbO3. The properties and performance of WO3 thin film and the ECD were studied through X-ray diffraction (XRD), scanning electron microscopy (SEM), and ultraviolet-visible spectrometry. WO3 thin film has more than 60% optical modulation with porous amorphous structure. The visible transmittance modulation of the ECD is more than 65%, and the response time of coloring and bleaching are 45 s and 25 s, respectively.

  16. Large-area flexible monolithic ITO/WO3/Nb2O5/NiVOχ/ITO electrochromic devices prepared by using magnetron sputter deposition

    Science.gov (United States)

    Tang, Chien-Jen; Ye, Jia-Ming; Yang, Yueh-Ting; He, Ju-Liang

    2016-05-01

    Electrochromic devices (ECDs) have been applied in smart windows to control the transmission of sunlight in green buildings, saving up to 40-50% electricity consumption and ultimately reducing carbon dioxide emissions. However, the high manufacturing costs and difficulty of transportation of conventional massive large area ECDs has limited widespread applications. A unique design replacing the glass substrate commonly used in the ECD windows with inexpensive, light-weight and flexible polymeric substrate materials would accelerate EC adoption allowing them to be supplemented for regular windows without altering window construction. In this study, an ITO/WO3/Nb2O5/NiVOχ/ITO all-solid-state monolithic ECD with an effective area of 24 cm × 18 cm is successfully integrated on a PET substrate by using magnetron sputter deposition. The electrochromic performance and bending durability of the resultant material are also investigated. The experimental results indicate that the ultimate response times for the prepared ECD is 6 s for coloring at an applied voltage of -3 V and 5 s for bleaching at an applied voltage of +3 V, respectively. The optical transmittances for the bleached and colored state at a wavelength of 633 nm are 53% and 11%, respectively. The prepared ECD can sustain over 8000 repeated coloring and bleaching cycles, as well as tolerate a bending radius of curvature of 7.5 cm.

  17. Thin Film Deposition Techniques (PVD)

    Science.gov (United States)

    Steinbeiss, E.

    The most interesting materials for spin electronic devices are thin films of magnetic transition metals and magnetic perovskites, mainly the doped La-manganites [1] as well as several oxides and metals for passivating and contacting the magnetic films. The most suitable methods for the preparation of such films are the physical vapor deposition methods (PVD). Therefore this report will be restricted to these deposition methods.

  18. Variable temperature semiconductor film deposition

    Science.gov (United States)

    Li, Xiaonan; Sheldon, Peter

    1998-01-01

    A method of depositing a semiconductor material on a substrate. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  19. Magneto-Seebeck effect in an ITO/PEDOT:PSS/Au thin-film device

    Directory of Open Access Journals (Sweden)

    Hongfeng Wang

    2016-04-01

    Full Text Available This article reports giant magnetic field effects on the Seebeck coefficient by exerting a Lorentz force on charge diffusion based on vertical multi-layer ITO/PEDOT:PSS/Au thin-film devices. The Lorentz force, induced by an external magnetic field, changes the charge transport and consequently generates angular dependent magnetoresistance. The proposed mechanism of the magneto-Seebeck effect is proved by measuring the magnetoresistance at a parallel, 45o and perpendicular angle to the temperature gradient. The gradual change of the magnetoresistance from a parallel to perpendicular angle indicates that the Lorentz force is a key driving force to develop the magneto-Seebeck effect. Therefore, our experimental results demonstrate a magnetic approach to control the thermoelectric properties in organic materials.

  20. Magneto-Seebeck effect in an ITO/PEDOT:PSS/Au thin-film device

    Science.gov (United States)

    Wang, Hongfeng; Liu, Qing; Tisdale, Jeremy; Xu, Ling; Liu, Yuchun; Hu, Bin

    2016-04-01

    This article reports giant magnetic field effects on the Seebeck coefficient by exerting a Lorentz force on charge diffusion based on vertical multi-layer ITO/PEDOT:PSS/Au thin-film devices. The Lorentz force, induced by an external magnetic field, changes the charge transport and consequently generates angular dependent magnetoresistance. The proposed mechanism of the magneto-Seebeck effect is proved by measuring the magnetoresistance at a parallel, 45o and perpendicular angle to the temperature gradient. The gradual change of the magnetoresistance from a parallel to perpendicular angle indicates that the Lorentz force is a key driving force to develop the magneto-Seebeck effect. Therefore, our experimental results demonstrate a magnetic approach to control the thermoelectric properties in organic materials.

  1. Preparation and characterizations of electroluminescent p-ZnO : N/n-ZnO : Ga/ITO thin films by spray pyrolysis method

    Directory of Open Access Journals (Sweden)

    C. Panatarani

    2016-02-01

    Full Text Available ZnO thin films were fabricated by spray pyrolysis (SP method with p-ZnO : N/n-ZnO:Ga/ITO structure. The X-ray results show that the deposited films have hexagonal wurtzite structure. The EDS results observed that the composition of Ga in ZnO:Ga and N in ZnO:N was 3.73% and 27.73% respectively. The photoluminescence (PL with excitation wave length of 260 nm shows that ZnO:Ga and ZnO:N films emitted UV emission at ∼393 and ∼388 nm, respectively and the films resistivity was 7.12 and 12.80 Ohm-cm respectively. The electroluminescence of the p-ZnO : N/n-ZnO:Ga/ITO structure was obtained by applying forward bias of 5 volt with 30 mA current, resulting in a 3.35 volt threshold bias with the peak electroluminescence in UV-blue range.

  2. 退火温度对ZnO掺杂ITO薄膜性能的影响%Influence of annealing temperature on properties of ZnO-doped ITO films

    Institute of Scientific and Technical Information of China (English)

    闫其昂; 石培培; 严启荣; 牛巧利; 章勇

    2012-01-01

    利用电子束蒸镀方法,在K8玻璃衬底上沉积ZnO掺杂ITO(ZnO—ITO)与ITO薄膜。研究不同退火温度对ZnO—ITO薄膜的微观结构的影响;对比分析了在不同退火温度条件下,ZnO—ITO和无掺杂ITO薄膜的光电性能。结果发现,ZnO—ITO薄膜具有较大的晶粒尺寸,随着退火温度的上升,晶体结构得到改善,表面粗糙度减小,薄膜的光电性能显著提高。ZnO—ITO薄膜经过500℃退火后得到最佳的综合性能,其表面均方根粗糙度(RMS)为32.52nm,电阻率为1.43×10^-4Ω·cm;对442nm波长的光,透射率可达98.37%;与ITO薄膜相比,ZnO—ITO薄膜具有显著的抗PEDOT:PSS溶液腐蚀的能力。%ZnOdoped indium tin oxide(ZnO.. ITO) and undoped ITO thin films were deposited on the ultrasonically cleaned K8 glass substrates by the electron-beam evaporation technique. The effect of annealing temperature on the microstrueture of ZnO-ITO thin films was investigated. The electrical and optical properties of ZnO-ITO and undoped ITO thin films have been contrastively analyzed. It is found that ZnOITO thin films show larger grain size and the crystalline structures become better; At the same time, the surface roughness gets lower with increasing annealing temperature. Further, the electrical and optical properties of ZnO-ITO thin films are remarkably improved. ZnO-ITO thin films annealed at 500 ℃ reveal the best comprehensive properties,including a root mean square roughness of 32.52 nm,a resistivity of 1.43 × 10 ^4 Ω · cm and a transmittance of 98. 37 % at 442 nm. Compared with undoped ITO films, the ZnO-ITO films show remarkable erosion-resisting ability to PEDOT: PSS.

  3. films using atomic layer deposition

    Science.gov (United States)

    Chervinskii, Semen; Matikainen, Antti; Dergachev, Alexey; Lipovskii, Andrey A.; Honkanen, Seppo

    2014-08-01

    We fabricated self-assembled silver nanoisland films using a recently developed technique based on out-diffusion of silver from an ion-exchanged glass substrate in reducing atmosphere. We demonstrate that the position of the surface plasmon resonance of the films depends on the conditions of the film growth. The resonance can be gradually shifted up to 100 nm towards longer wavelengths by using atomic layer deposition of titania, from 3 to 100 nm in thickness, upon the film. Examination of the nanoisland films in surface-enhanced Raman spectrometry showed that, in spite of a drop of the surface-enhanced Raman spectroscopy (SERS) signal after the titania spacer deposition, the Raman signal can be observed with spacers up to 7 nm in thickness. Denser nanoisland films show slower decay of the SERS signal with the increase in spacer thickness.

  4. Effective tool design of three-rank form as precision removal-process of ITO thin-films

    Institute of Scientific and Technical Information of China (English)

    Pai-shan PA

    2009-01-01

    A new effective tool design of three-rank form of electroremoval was present using a precision recycle system offering faster performance in removing the indium-tin-oxide(ITO) thin-films on color filter surface of displays. Higher electric power is not required since the three-rank form tool is adopted as a feeding mode to reduce the response area. The low yield of ITO persists throughout the entire semiconductor production process. By establishing a recycle process of ultra-precise removal of the thin-film nanostructure, defective products in the optoelectronic semiconductors industry can be effectively recycled, decreasing both production costs and pollution. A 5th generation TFT-LCD was used. The design features of the removal processes for the thin-films and the tool design of three-rank form were of major interest. For the precision removal processes, a pulsed current can improve the effect of dreg discharge and contributes to the achievement of a fast workpiece (displays' color filter) feed rate, but raises the current rating. High flow velocity of the electrolyte with a high rotational speed of the tool electrodes elevates the ITO removal effect. A displays' color filter with a fast feed rate is combined with enough electric power to provide highly effective removal. A small thickness of the rank and a small arc angle of the negative-electrode correspond to a higher removal rate for ITO-film. An effective three-rank form negative-electrode provides larger discharge mobility and better removal effect. It only needs a short period of time to remove the ITO easily and cleanly.

  5. Electrochemical characterization of organosilane-functionalized nanostructured ITO surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Pruna, R., E-mail: rpruna@el.ub.edu; Palacio, F.; López, M. [SIC, Departament d' Enginyeries: Electrònica, Universitat de Barcelona, C/ Martí i Franquès 1, E-08028 Barcelona (Spain); Pérez, J. [Nanobioengineering Group, Institute for Bioengineering of Catalonia (IBEC), Baldiri Reixac 15-21, E-08028 Barcelona (Spain); Mir, M. [Nanobioengineering Group, Institute for Bioengineering of Catalonia (IBEC), Baldiri Reixac 15-21, E-08028 Barcelona (Spain); Centro de Investigación Biomédica en Red en Bioingeniería, Biomateriales y Nanomedicina (CIBER-BBN), Monforte de Lemos 3-5 Pabellón 11, E-28029 Madrid (Spain); Blázquez, O.; Hernández, S.; Garrido, B. [MIND-IN" 2UB, Departament d' Enginyeries: Electrònica, Universitat de Barcelona, C/ Martí i Franquès 1, E-08028 Barcelona (Spain)

    2016-08-08

    The electroactivity of nanostructured indium tin oxide (ITO) has been investigated for its further use in applications such as sensing biological compounds by the analysis of redox active molecules. ITO films were fabricated by using electron beam evaporation at different substrate temperatures and subsequently annealed for promoting their crystallization. The morphology of the deposited material was monitored by scanning electron microscopy, confirming the deposition of either thin films or nanowires, depending on the substrate temperature. Electrochemical surface characterization revealed a 45 % increase in the electroactive surface area of nanostructured ITO with respect to thin films, one third lower than the geometrical surface area variation determined by atomic force microscopy. ITO surfaces were functionalized with a model organic molecule known as 6-(ferrocenyl)hexanethiol. The chemical attachment was done by means of a glycidoxy compound containing a reactive epoxy group, the so-called 3-glycidoxypropyltrimethoxy-silane. ITO functionalization was useful for determining the benefits of nanostructuration on the surface coverage of active molecules. Compared to ITO thin films, an increase in the total peak height of 140 % was observed for as-deposited nanostructured electrodes, whereas the same measurement for annealed electrodes resulted in an increase of more than 400 %. These preliminary results demonstrate the ability of nanostructured ITO to increase the surface-to-volume ratio, conductivity and surface area functionalization, features that highly benefit the performance of biosensors.

  6. Influence of substrates on the structural and optical properties of chemically deposited CdS films

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jae-Hyeong [School of Electronic and Information Engineering, Kunsan National University, San 68, Miryong-dong, Kunsan, Jeollabuk-do, 573-701 (Korea, Republic of)]. E-mail: jhyi@kunsan.ac.kr

    2007-05-31

    Cadmium sulfide (CdS) films were chemically deposited on glass, polycarbonate (PC), polyethylene terephthalate (PET), and Si wafer. Effects of substrate types on the structural and optical properties of the films were investigated. There is a preferential orientation of the crystallites in the film grown on the glass along the c-axis (perpendicular to the plane of the substrate) producing a strong hexagonal (0 0 2) or cubic (1 1 1) peak, regardless of the presence of ITO coating. However, such preferential orientation decreases or disappears when the deposition was made onto PC or PET substrates. The crystallinity of CdS films on glass and Si is better than that of the other ones. The average transmittance of the films on PC and PET is about 50% and 55%, respectively, and increases up to 70% for glass substrate. The improvement of the transmittance was obtained from ITO-coated substrates.

  7. Electrochemistry of LB films of mixed MGDG:UQ on ITO.

    Science.gov (United States)

    Hoyo, Javier; Guaus, Ester; Torrent-Burgués, Juan; Sanz, Fausto

    2015-08-01

    The electrochemical behaviour of biomimetic monolayers of monogalactosyldiacylglycerol (MGDG) incorporating ubiquinone-10 (UQ) has been investigated. MGDG is the principal component in the thylakoid membrane and UQ seems a good substitute for plastoquinone-9, involved in photosynthesis chain. The monolayers have been performed using the Langmuir and Langmuir-Blodgett (LB) techniques and the redox behaviour of the LB films, transferred at several surface pressures on a glass covered with indium-tin oxide (ITO), has been characterized by cyclic voltammetry. The cyclic voltammograms show that UQ molecules present two redox processes (I and II) at high UQ content and high surface pressures, and only one redox process (I) at low UQ content and low surface pressures. The apparent rate constants calculated for processes I and II indicate a different kinetic control for the reduction and the oxidation of UQ/UQH2 redox couple, being k(Rapp)(I) = 2.2 · 10(-5) s(-1), k(Rapp)(II) = 5.1 · 10(-14) k(Oapp)(I) = 3.3 · 10(-3) s(-1) and k(Oapp)(II) = 6.1 · 10(-6) s(-1), respectively. The correlation of the redox response with the physical states of the LB films allows determining the positions of the UQ molecules in the biomimetic monolayer, which change with the surface pressure and the UQ content. These positions are known as diving and swimming. Copyright © 2015 Elsevier B.V. All rights reserved.

  8. Nanofriction properties of molecular deposition films

    Institute of Scientific and Technical Information of China (English)

    王强斌; 高芒来; 张嗣伟

    2000-01-01

    The nanofriction properties of Au substrate and monolayer molecular deposition film and multilayer molecular deposition films on Au substrate and the molecular deposition films modified with alkyl-terminal molecule have been investigated by using an atomic force microscope. It is concluded that ( i ) the deposition of molecular deposition films on Au substrate and the modification of alkyl-terminal molecule to the molecular deposition films can reduce the frictional force; (ii) the molecular deposition films with the same terminal exhibit similar nanofriction properties, which has nothing to do with the molecular chain-length and the layer number; (iii) the unstable nanofriction properties of molecular deposition films are contributed to the active terminal of the molecular deposition film, which can be eliminated by decorating the active molecular deposition film with alkyl-terminal molecule, moreover, the decoration of alkyl-terminal molecule can lower the frictional force conspicuously; (iv) the relat

  9. Effect of Se flux on CuGaSe2 absorbers deposited on ITO-coated SLG substrates by using a three-stage co-evaporation process

    Science.gov (United States)

    Yoo, Jinsu; Eo, Young-Joo; Cho, Jun-Sik; Yun, Jae-Ho; Choi, Jang Hun; Kim, Kihwan; Park, Ju Hyung; Kong, Seong Ho

    2016-11-01

    As the key factor for top-cell application in a tandem structure, wide-bandgap chalcopyrite CuGaSe2 (CGS) absorbers were deposited at a thickness of 2 μm on soda-lime glass (SLG) which was coated with radio-frequency sputtered indium-tin-oxide (ITO) films. The semi-transparent CGS absorbers with a bandgap energy of 1.65 eV were grown by using a three-stage co-evaporation process with Cu, Ga, and Se elemental sources. During CGS absorber growth, the composition ratio [Cu]/[Ga] was fixed at about 0.85 and the Se-to-Ga flux ratio P [ Se]/[ Ga] was varied from 22 to 61 by increasing the temperature of the Se source. In this study, the compositional, structural, optical and electrical properties of top-cell CGS absorbers, which absorbed the short wavelength range of the solar spectrums for tandem solar cell application, were investigated as a function of the Se flux. On the basis of our experimental results, the highest CGS solar cell efficiency of 4.7 % in the cell structure described as Al/ZnO:Al/i-ZnO/CdS/CGS/ITO/SLG was demonstrated using a P [ Se]/[ Ga] value of 22.

  10. Effect of temperature and NO2 surface adsorption on electrical properties of screen printed ITO thin film

    Science.gov (United States)

    Madhi, I.; Meddeb, W.; Bouzid, B.; Saadoun, M.; Bessaïs, B.

    2015-11-01

    Indium tin oxide films with thicknesses of about 1 μm were prepared using the screen printing technique. Preliminary X-ray diffraction studies show that the formed ITO crystallizes in the cubic crystal system. The crystallite size (D) and the microstrain (ɛstr) were investigated using Scherrer formula and Williamson-Hall analysis. Scanning electron microscopy and transmission electron microscopy show that the ITO films are granular, essentially composed of uniformly distributed sub-spherical - like grains. The variation of the DC conductivity with temperature confirms the presence of three activation energies, indicating the presence of different scattering mechanisms essentially dominated by oxygen adsorption and thermal excitation of electrons in the conduction band. Detailed studies of the dielectric parameters (i.e., ɛ* and tan δ) of the compound as a function of temperature and NO2 adsorption (at various range of frequencies) reveal that their values are strongly dependent on temperature and NO2 adsorption.

  11. Pulsed Nd:YAG laser deposition of indium tin oxide thin films in different gases and organic light emitting device applications

    Energy Technology Data Exchange (ETDEWEB)

    Yong, T.Y. [Faculty of Engineering, Multimedia University, Cyberjaya, 63100 Selangor (Malaysia); Tou, T.Y. [Faculty of Engineering, Multimedia University, Cyberjaya, 63100 Selangor (Malaysia)], E-mail: tytou@mmu.edu.my; Yow, H.K. [Faculty of Engineering, Multimedia University, Cyberjaya, 63100 Selangor (Malaysia); Safran, G. [Research Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, 1121 Konkoly-Thege ut 29-33, Budapest XII (Hungary)

    2008-04-30

    The microstructures, electrical and optical properties of indium-doped tin oxide (ITO) films, deposited on glass substrates in different background gases by a pulsed Nd:YAG laser, were characterized. The optimal pressure for obtaining the lowest resistivity in ITO thin film is inversely proportional to the molecular weight of the background gases, namely the argon (Ar), oxygen (O{sub 2}), nitrogen (N{sub 2}) and helium (He). While substrate heating to 250 deg. C decreased the ITO resistivity to < 4 x 10{sup -4} {omega} cm, obtaining the optical transmittance of higher than 90% depended mainly on the background gas pressure for O{sub 2} and Ar. Obtaining the lowest ITO resistivity, however, did not beget a high optical transmittance for ITO deposition in N{sub 2} and He. Scanning electron microscope pictures show distinct differences in microstructures due to the background gas: nanostructures when using Ar and N{sub 2} but polycrystalline for using O{sub 2} and He. The ITO surface roughness varied with the deposition distance. The effects on the molecularly doped, single-layer organic light emitting device (OLED) operation and performance were also investigated. Only ITO thin films prepared in O{sub 2} and Ar are suitable for the fabrication OLED with performance comparable to that fabricated on the commercially available, magnetron-sputtered ITO.

  12. Characterization of sputtering CoFe-ITO junction for spin injection

    Institute of Scientific and Technical Information of China (English)

    WEN Qiye; SONG Yuanqiang; YANG Qinghui; ZHANG Huaiwu

    2006-01-01

    The combination of ferromagnetic metal (FM) and semiconductor (SC) for spin injection was studied and demonstrated with FM-SC-FM junction. The semiconductor was chosen to be doped Indium-Tin-Oxide(ITO). Both ITO single-layer film and CoFe-ITO-CoFe junction were sputtering deposited. The ITO single-layer film wasn-type with a small resistance of about 100 Ω/Square. I-V curves and Magnetoresistance (MR) effect of the CoFe-ITO-CoFe junction were measured at room temperature and 77 K. Results show that the CoFe forms an ohmic contact to ITO film. But at low temperature, the I-V curves show a Schottky-like characteristic, which is strongly affect by applied magnetic field. The MR effect was measured to be 1% at 77 K, which indicates a spin injection into semiconductor to be realized in this sandwich junction.

  13. Electrochemical deposition of conductive and adhesive polypyrrole-dopamine films

    Science.gov (United States)

    Kim, Semin; Jang, Lindy K.; Park, Hyun S.; Lee, Jae Young

    2016-07-01

    Electrode surfaces have been widely modified with electrically conductive polymers, including polypyrrole (PPY), to improve the performance of electrodes. To utilize conductive polymers for electrode modification, strong adhesion between the polymer films and electrode substrates should be ensured with high electrical/electrochemical activities. In this study, PPY films were electrochemically polymerized on electrodes (e.g., indium tin oxide (ITO)) with dopamine as a bio-inspired adhesive molecule. Efficient and fast PPY electrodeposition with dopamine (PDA/PPY) was found; the resultant PDA/PPY films exhibited greatly increased adhesion strengths of up to 3.7 ± 0.8 MPa and the modified electrodes had electrochemical impedances two to three orders of magnitude lower than that of an unmodified electrode. This electrochemical deposition of adhesive and conductive PDA/PPY offers a facile and versatile electrode modification for various applications, such as biosensors and batteries.

  14. Nanostructured as-deposited indium tin oxide thin films for broadband antireflection and light trapping

    Science.gov (United States)

    Khan, Imran; Bauch, Martin; Dimopoulos, Theodoros; Dostalek, Jakub

    2017-08-01

    Indium tin oxide (ITO) thin films were sputter-deposited at ambient temperature on a glass-like substrate that was periodically nanostructured by UV nanoimprint lithography. Cross gratings of the corrugated and conformal ITO, with different periods and modulation depths, were tailored to exhibit light trapping or antireflection properties at specific spectral windows by combined optical simulations and experiments. For dense gratings, the light transmission in the 450-850 nm range was enhanced by 8% (absolute) compared to flat ITO films, which is one of the largest performance improvements reported in the literature for nanostructured transparent electrodes. Increasing the grating period shifts the threshold for diffraction coupling to waveguide modes in the visible and near infrared part of the spectrum, resulting in broad light trapping behaviour at wavelengths below this threshold. This work demonstrates a simple processing route at ambient temperature for the fabrication of high-performance transparent electrodes in order to fulfil different device requirements.

  15. ITO-free organic light-emitting diodes with MoO{sub 3}/Al/MoO{sub 3} as semitransparent anode fabricated using thermal deposition method

    Energy Technology Data Exchange (ETDEWEB)

    Lu, Hsin-Wei; Huang, Ching-Wen [Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China); Kao, Po-Ching [Department of Electrophysics, National Chiayi University, Chiayi 60004, Taiwan (China); Chu, Sheng-Yuan, E-mail: chusy@mail.ncku.edu.tw [Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China); Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101, Taiwan (China)

    2015-08-30

    Highlights: • In this paper, the structure of the proposed devices is substrate (glass; polyethersulfone (PES))/anode (MoO{sub 3}/Al/MoO{sub 3}; MoO{sub 3}/Al)/α-naphthylphenylbiphenyl diamine (NPB) (40 nm)/tris (8-hydroxyquinoline) aluminum (Alq3) (60 nm)/LiF (1 nm)/Al (150 nm). • The optical transmittance of the metal layer was enhanced by depositing metal oxidation (MoO{sub 3}) and metal (Al) layers. • The optimized films show the typical sheet resistance of 7 Ω/sq and a high transmittance of 70% at 550 nm. • The indium-tin-oxide (ITO)-free OLEDs with the fabricated composite anodes on a glass substrate exhibited the high luminance and current efficiency of 21,750 cd/m{sup 2} and 3.18 cd/A, respectively. • The bending effects on PES substrate by depositing metal oxidation (MoO{sub 3}) and metal (Al) layers were also investigated. • MoO{sub 3} covering the Al layer modifies the surface of the electrode and enhances the durability. The surface roughness of the bi-layer films was higher than that of the tri-layer films. Therefore, OLEDs with OMO anode outperform those with bi-layer films anode. - Abstract: In this paper, semitransparent electrodes with the structure substrate/MoO{sub 3}/Al/MoO{sub 3} (OMO) were fabricated via the thermal deposition method for use as the anode in organic light-emitting diodes (OLEDs). The optical transmittance of the metal layer was enhanced by depositing metal oxidation (MoO{sub 3}) and metal (Al) layers. The optimal thickness of the Al thin films was determined to be 15 nm for high optical transmittance and good electrical conductivity. The optimized films show the typical sheet resistance of 7 Ω/sq and a high transmittance of 70% at 550 nm. The indium-tin-oxide (ITO)-free OLEDs with the fabricated composite anodes on a glass substrate exhibited the high luminance and current efficiency of 21,750 cd/m{sup 2} and 3.18 cd/A, respectively. In addition, bending effects on the polyethersulfone (PES) substrate/MoO{sub 3

  16. Gravure printing of transparent conducting ITO coatings for display applications

    Science.gov (United States)

    Puetz, Joerg; Heusing, Sabine; de Haro Moro, Marcos; Ahlstedt, C. Mikael; Aegerter, Michel A.

    2005-09-01

    Transparent conducting coatings and patterns of ITO (indium tin oxide) were deposited by a direct gravure printing on PET foils using nanoparticle-based UV-curable inks. Solid areas with thicknesses ranging between 300 and >1000 nm were obtained by varying the ink composition (e.g. ITO content, solvents) and fundamental parameters of the printing plate such as the line density. The best ITO coating patterns showed a sheet resistance of 3 to 10 kΩ□ and a transmission of up to 88 % with a haze of less than 1 %. One of the most crucial steps during film formation is the drying of the wet film as it changes the rheology and polarity of the ink and in consequence decisively influences the film formation. Typical fields of application of the gravure-printed ITO patterned electrodes include smart windows, flexible displays and printed electronics.

  17. Direct evidence of visible surface plasmon excitation in ITO film coated on LiNbO3 slabs.

    Science.gov (United States)

    Zhao, Hua; Wang, Yince; Xue, Tingyu; Su, Hang; Zhang, Jingwen

    2017-03-20

    An iron-doped Y-cut lithium niobate (Fe:LN) slab was coated with indium-tin-oxide (ITO) thin films by magnetron sputtering. The electron confinement in a sub-nanometer region at ITO/LN interfaces is resulted from electric screening effect. Consequently, the local plasma frequency in the sub-nanometer metallic-like layer is shifted to the UV regime. This makes it possible to excite surface plasmon polaritons (SPPs) in the visible region with photorefractive phase gratings in the LN slab and to transport SPPs much energy-efficiently. Direct evidence of the excitation of SPPs was demonstrated by the presence of deep transmission spectral valleys in the transmission spectra and striking dark bands in the 2D diffraction patterns while using a white reading beam. Theoretical arguments and confirmation experiments are presented to elucidate all the related findings.

  18. Modification of ITO Surface for High Performance of Electrochromic Polymer Film%获得高性能电致变色薄膜的ITO表面修饰方法

    Institute of Scientific and Technical Information of China (English)

    杨树威; 郑建明; 吴星明; 徐春叶

    2013-01-01

    The relatively low reactivity of indium tin oxide (ITO) thin film coated on glass with its good conductivity and transparency make it the widely used electrode in displays and electrochromic devices.However,the inactivity of the surface may cause serious problems for physically deposited electrochromic polymer films from detachment to short durability,especially,in the presence of electrolyte liquids.We here report that significant improvement is made for electrochromic films of poly[3,4-(2,2-dimethylpropylenedioxy)thiophene] by electrodepositing its monomer on ITO surface modified with organic acids.We first designed and synthesized 2-thienyl phosphonic acid which was used to modify ITO glass.ITO glass was immersed in modifier solution vertically on a glass bracket and the solution was allowed to evaporate slowly at ambient condition.The glass was removed from the glass bracket when it was fully exposed to the air,and then baked at 120 ℃ for 24 hin glove box.After modification,the modifier molecules are able to react with hydroxyl groups on ITO surface by losing H2O and self-assemble to high-order monolayer.X-ray photoelectron spectroscopy results indicate that chemical binding is formed between the surface and the modifier.By attaching the modifier molecules to ITO surface with ester bonds,the surface changes from hydrophilic to hydrophobic,but the transmittance and conductivity remain the same as bare ITO.Atomic force microscope results demonstrate that surface roughness of modified ITO showed a little reduction compared with bare one.To test the mechanical strength of electrochromic polymer thin film on different substrate,we treated the films by sonication.The results reveal a much better stability for the film formed on the modified ITO than that on bare one.Meanwhile,color changing property of electrochromic polymer film electropolymerized on modified substrate remains the same as that on bare substrate.This study provides a conventional way to achieve

  19. Preparation of Indium Tin Oxide films deposited by reactive evaporation at different substrate-temperature and the properties

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    The Indium Tin Oxide films have been prepared at different substrate-temperature on glass substrates by reactive evaporation of In-Sn alloy with an oxygen pressure of 1.3 × 10-1 Pa and a deposition rate of 10-2 nm/s. The best ITO films obtained cm2v-1s-1. The influence of the substrate-temperature on the structural, optical and electrical properties of the obtained films has been investigated.

  20. Effect of pyrolytic temperature on the properties of TiO2/ITO films for hydrogen sensing.

    Science.gov (United States)

    Vijayalakshmi, K; Jereil, S David; Karthick, K

    2015-03-05

    Titanium dioxide (TiO2) thin films were prepared on ITO (222) coated glass substrates by spray pyrolysis technique. The influence of substrate temperature on the orientation, phase, vibrational bands and band gap energy of TiO2 films were discussed. The X-ray diffraction patterns of the films revealed preferentially oriented (101) TiO2 anatase phase at the substrate temperature of 300°C and 350°C. Fourier transform infrared spectra of the films showed the significant sharpening of absorption band at ∼645cm(-1) with increase in substrate temperature, which clearly indicates the formation of anatase phase dependent on substrate temperature. Fourier Raman Spectra of the films showed the significant presence of long range order anatase TiO2 phase. The optical measurements of the film prepared at different substrate temperatures revealed the direct band gap of 3.15-3.63eV and indirect band gap of 3.48-3.73eV, characteristic of TiO2 anatase phase. To understand the enhancement of sensing performances of TiO2 films with substrate temperature, the gas sensing mechanism of the films towards 400sccm of hydrogen at room temperature was studied and discussed.

  1. ITO/ATO bilayer transparent electrodes with enhanced light scattering, thermal stability and electrical conductance

    Science.gov (United States)

    Guillén, C.; Montero, J.; Herrero, J.

    2016-10-01

    Transparent electrodes based on In2O3:Sn (ITO) and SnO2:Sb (ATO) thin films have been deposited by sputtering at room temperature on soda lime glass (SLG) substrates. The preparation conditions were adjusted to obtain 250 nm-thick ITO layers with high conductivity and textured ATO coatings with various thicknesses from 80 to 200 nm. These ITO and ATO films have been combined to enhance the optical scattering and the electrical conductivity of the bilayer electrodes. Besides, a suitable ATO coating can prevent the oxidation of the ITO underlayer, thus increasing the stability of the overall electrical performance. With this purpose the structure, morphology, optical and electrical properties have been analysed comparatively for SLG/ITO, SLG/ATO and SLG/ITO/ATO samples after heating in air at 500 °C, studying the influence of the ATO layer thickness on the light scattering and thermal stability of the electrodes. In this way, a minimum sheet resistance of 8 Ω/sq has been achieved with a 120 nm-thick ATO film deposited on the 250 nm-thick ITO layer; such stacked electrode has visible transmittance near 80% and average haze HT = 10%, showing superior stability, light scattering and electrical performance than the isolated ITO and ATO films.

  2. Synergetic effect of LaB{sub 6} and ITO nanoparticles on optical properties and thermal stability of poly(vinylbutyral) nanocomposite films

    Energy Technology Data Exchange (ETDEWEB)

    Tang, Hongbo; Su, Yuchang; Hu, Te; Liu, Shidong; Mu, Shijia; Xiao, Lihua [Central South University, School of Materials Science and Engineering, Changsha (China)

    2014-12-15

    In this work, different compositions of lanthanum hexaboride (LaB{sub 6}) and tin-doped indium oxide (ITO) nanoparticles were doped into poly(vinylbutyral) (PVB) matrix to prepare PVB/LaB{sub 6}-ITO nanocomposite (PLINC) films by a solution casting method. X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, thermogravimetric analysis (TGA) and ultraviolet-visible-near infrared spectroscopy (UV-vis-NIR) were employed to characterize the PLINCs. The TGA and UV-vis-NIR results reveal that the nanocomposite films possessed outstanding thermal stability. The temperature where 5 % weight loss of the PVB matrix was improved after the addition of LaB{sub 6} and ITO particles and the property for blocking near infrared light was also enhanced as compared with the case of pure PVB film. (orig.)

  3. Chemical surface deposition of cds thin films from CdI2 aqueous solution

    Directory of Open Access Journals (Sweden)

    G. Il’chuk

    2009-01-01

    Full Text Available For the first time using CdI2 solution CdS films on glass and ITO coated glass substrates were produced by the method of layerwise chemical surface deposition (ChSD. CdS thin films with the widths from 40 nm to 100 nm were obtained for windows in solar cells based on CdS/CdTe heterojunctions. Changes of the structural and optical properties of CdS films due to air annealing are shown.

  4. Pulsed laser deposition: Prospects for commercial deposition of epitaxial films

    Energy Technology Data Exchange (ETDEWEB)

    Muenchausen, R.E.

    1999-03-01

    Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique for the deposition of thin films. The vapor source is induced by the flash evaporation that occurs when a laser pulse of sufficient intensity (about 100 MW/cm{sup 2}) is absorbed by a target. In this paper the author briefly defines pulsed laser deposition, current applications, research directed at gaining a better understanding of the pulsed laser deposition process, and suggests some future directions to enable commercial applications.

  5. Energetic deposition of thin metal films

    CERN Document Server

    Al-Busaidy, M S K

    2001-01-01

    deposited films. The primary aim of this thesis was to study the physical effect of energetic deposition metal thin films. The secondary aim is to enhance the quality of the films produced to a desired quality. Grazing incidence X-ray reflectivity (GIXR) measurements from a high-energy synchrotron radiation source were carried out to study and characterise the samples. Optical Profilers Interferometery, Atomic Force Microscope (AFM), Auger electron spectroscopy (AES), Medium energy ion spectroscopy (MEIS), and the Electron microscope studies were the other main structural characterisation tools used. AI/Fe trilayers, as well as multilayers were deposited using a Nordico planar D.C. magnetron deposition system at different voltage biases and pressures. The films were calibrated and investigated. The relation between energetic deposition variation and structural properties was intensely researched. Energetic deposition refers to the method in which the deposited species possess higher kinetic energy and impact ...

  6. Influence of ITO deposition and post annealing on HIT solar cell structures

    NARCIS (Netherlands)

    Zhang, D.; Tavakoliyaraki, A.; Wu, Y.; Van Swaaij, R.A.C.M.M.; Zeman, M.

    2011-01-01

    Heterojunction silicon with intrinsic thin layer (HIT) solar cells that combine advanced thin-film hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si) technologies are promising because of the high performance at low cost. Due to the low conductivity of a-Si:H, indium tin oxide (I

  7. Influence of ITO deposition and post annealing on HIT solar cell structures

    NARCIS (Netherlands)

    Zhang, D.; Tavakoliyaraki, A.; Wu, Y.; Van Swaaij, R.A.C.M.M.; Zeman, M.

    2011-01-01

    Heterojunction silicon with intrinsic thin layer (HIT) solar cells that combine advanced thin-film hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si) technologies are promising because of the high performance at low cost. Due to the low conductivity of a-Si:H, indium tin oxide (I

  8. Efficient photocatalytic decolorization of some textile dyes using Fe ions doped polyaniline film on ITO coated glass substrate.

    Science.gov (United States)

    Haspulat, Bircan; Gülce, Ahmet; Gülce, Handan

    2013-09-15

    In this study, the photocatalytic decolorization of four commercial textile dyes with different structures has been investigated using electrochemically synthesized polyaniline and Fe ions doped polyaniline on ITO coated glass substrate as photocatalyst in aqueous solution under UV irradiation for the first time. Scanning electron microscopy, atomic force microscopy, FT-IR spectra, UV-vis spectroscopy measurements were used to characterize the electrochemically synthesized polymer film photocatalyst. Film hydrophilicity was assessed from contact angle measurements. The results show that both of the polymer films exhibit good photocatalytic performance. Surprisingly, it was determined that by using Fe(II) ions during polymerization, it is possible to modify the surface roughness and wettability of the produced polyaniline films which favors their photocatalytic activity in water-based solutions. All four of the used dyes (methylene blue, malachite green, methyl orange and methyl red) were completely decolorizated in 90 min of irradiation under UV light by using Fe ions doped polyaniline at the dye concentration of 1.5 × 10(-5)M, while the decolorization of those dyes were between 43% and 83% by using polyaniline as photocatalyst. Hence, it may be a viable technique for the safe disposal of textile wastewater into waste streams.

  9. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  10. The physical reason of intense electroluminescence in ITO-Si heterostructures

    Energy Technology Data Exchange (ETDEWEB)

    Malik, Oleksandr [Electronics Department, National Institute for Astrophysics, Optics, and Electronics (INAOE), P.O. 51 and 216, Puebla, 72000 (Mexico)], E-mail: amalik@inaoep.mx; Martinez, Arturo I.; Hidalga W, F.J. de la [Electronics Department, National Institute for Astrophysics, Optics, and Electronics (INAOE), P.O. 51 and 216, Puebla, 72000 (Mexico)

    2007-10-15

    Intense electroluminescence from a spray deposited heavily tin-doped indium oxide (ITO)-n type silicon (Si) heterojunctions, presenting the properties of an induced p-n junction, has been observed. The role of the degenerated n-type ITO film as a good supplier of holes to maintain an inversion layer formed at the silicon interface is discussed. However, the physical mechanism responsible for a significantly higher quantum efficiency of the radiation emission from such structures is not clear. The explanation of this phenomenon, based on the confinement of carriers at the interface due to multi-point contacts between the ITO film and the silicon, is discussed.

  11. 白光干涉测量超薄透明电极 ITO 薄膜的厚度%Measurement of ITO transparent electrode film thickness with white-light interferometer

    Institute of Scientific and Technical Information of China (English)

    2015-01-01

    随着平板显示技术的发展,透明电极ITO膜的厚度越来越薄。为了测试这种极薄的ITO膜,本文通过改进已有的频域分析算法,以便测试膜厚在20~150 nm之间的ITO膜。与现有算法相比,该算法有效改进了各个波长的位相解析精度。实验结果表明,待测透明电极薄膜的厚度为90~104 nm,其结果和标定值一致,证明了该算法能够测量膜厚小于100 nm的透明电极ITO薄膜。%The transparent electrode thin film of ITO is widely used to implement the touch function of flat panel display ( FPD) .Its physical thickness has a great impact on touch panel operation , therefore it is very important to measure the thickness of transparent electrode film .The frequency domain analysis algorithm has been used to measure film thickness .However , it is difficult to measure the very thin film .A new algorithm is proposed to measure the film thickness ranged from 20 nm to 150 nm.This algorithm aims to get the precision phase distribution due to multiple reflection of film .The experimental results show that the thickness of the measured transparent electrode film is 90-104 nm, which illustrates that there is no difference from the cali-bration value .This result proves that the new algorithm can be used to measure the very thin film of ITO within 100 nm .

  12. Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices

    Directory of Open Access Journals (Sweden)

    Jephias Gwamuri

    2016-01-01

    Full Text Available The opportunity for substantial efficiency enhancements of thin film hydrogenated amorphous silicon (a-Si:H solar photovoltaic (PV cells using plasmonic absorbers requires ultra-thin transparent conducting oxide top electrodes with low resistivity and high transmittances in the visible range of the electromagnetic spectrum. Fabricating ultra-thin indium tin oxide (ITO films (sub-50 nm using conventional methods has presented a number of challenges; however, a novel method involving chemical shaving of thicker (greater than 80 nm RF sputter deposited high-quality ITO films has been demonstrated. This study investigates the effect of oxygen concentration on the etch rates of RF sputter deposited ITO films to provide a detailed understanding of the interaction of all critical experimental parameters to help create even thinner layers to allow for more finely tune plasmonic resonances. ITO films were deposited on silicon substrates with a 98-nm, thermally grown oxide using RF magnetron sputtering with oxygen concentrations of 0, 0.4 and 1.0 sccm and annealed at 300 °C air ambient. Then the films were etched using a combination of water and hydrochloric and nitric acids for 1, 3, 5 and 8 min at room temperature. In-between each etching process cycle, the films were characterized by X-ray diffraction, atomic force microscopy, Raman Spectroscopy, 4-point probe (electrical conductivity, and variable angle spectroscopic ellipsometry. All the films were polycrystalline in nature and highly oriented along the (222 reflection. Ultra-thin ITO films with record low resistivity values (as low as 5.83 × 10−4 Ω·cm were obtained and high optical transparency is exhibited in the 300–1000 nm wavelength region for all the ITO films. The etch rate, preferred crystal lattice growth plane, d-spacing and lattice distortion were also observed to be highly dependent on the nature of growth environment for RF sputter deposited ITO films. The structural, electrical

  13. Efficient photocatalytic decolorization of some textile dyes using Fe ions doped polyaniline film on ITO coated glass substrate

    Energy Technology Data Exchange (ETDEWEB)

    Haspulat, Bircan; Gülce, Ahmet; Gülce, Handan, E-mail: hgulce@selcuk.edu.tr

    2013-09-15

    Highlights: • The PANI/Fe film as photocatalyst was used for the first time. • It was possible to modify the surface roughness and wettability of the PANI films. • The photocatalytic decolorization of four dyes has been investigated. • The photocatalytical activity of the PANI matrix was increased by adding Fe ions. -- Abstract: In this study, the photocatalytic decolorization of four commercial textile dyes with different structures has been investigated using electrochemically synthesized polyaniline and Fe ions doped polyaniline on ITO coated glass substrate as photocatalyst in aqueous solution under UV irradiation for the first time. Scanning electron microscopy, atomic force microscopy, FT-IR spectra, UV–vis spectroscopy measurements were used to characterize the electrochemically synthesized polymer film photocatalyst. Film hydrophilicity was assessed from contact angle measurements. The results show that both of the polymer films exhibit good photocatalytic performance. Surprisingly, it was determined that by using Fe(II) ions during polymerization, it is possible to modify the surface roughness and wettability of the produced polyaniline films which favors their photocatalytic activity in water-based solutions. All four of the used dyes (methylene blue, malachite green, methyl orange and methyl red) were completely decolorizated in 90 min of irradiation under UV light by using Fe ions doped polyaniline at the dye concentration of 1.5 × 10{sup −5} M, while the decolorization of those dyes were between 43% and 83% by using polyaniline as photocatalyst. Hence, it may be a viable technique for the safe disposal of textile wastewater into waste streams.

  14. Spray pyrolytic deposition of polycrystalline Cu{sub 2}S thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Woo-Young [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of); Palve, Balasaheb M. [Department of Physics, University of Pune, Pune 411 007 (India); Pathan, Habib M. [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of); Department of Physics, University of Pune, Pune 411 007 (India); Joo, Oh-Shim, E-mail: joocat@kist.re.kr [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of)

    2011-12-15

    Highlights: Black-Right-Pointing-Pointer Synthesis of polycrystalline Cu{sub 2}S films with band gap of 1.5 eV which is truly useful for solar cell applications. Black-Right-Pointing-Pointer Deposition has been carried out without any complexing agent. Black-Right-Pointing-Pointer Films are compact. - Abstract: Polycrystalline copper sulfide (Cu{sub 2}S) thin films were deposited by spray pyrolysis using aqueous solutions of copper nitrate and thiourea without any complexing agent at substrate (deposition) temperature of {approx}200 Degree-Sign C. The films were deposited onto glass and ITO-coated glass substrates. The deposited films were observed to be blackish brown in color, well adherent to the substrate, pin-hole free and uniform. The structural, surface morphological and optical properties of the films were carried out by means of X-ray diffraction, scanning electron microscopy and optical absorbance measurement techniques. XRD analysis showed that deposited films are chemically close to chalcocite, Cu{sub 2}S. The optical band gap was calculated to be 1.5 eV.

  15. Thin Film & Deposition Systems (Windows)

    Data.gov (United States)

    Federal Laboratory Consortium — Coating Lab: Contains chambers for growing thin film window coatings. Plasma Applications Coating Lab: Contains chambers for growing thin film window coatings. Solar...

  16. Thin Film & Deposition Systems (Windows)

    Data.gov (United States)

    Federal Laboratory Consortium — Coating Lab: Contains chambers for growing thin film window coatings. Plasma Applications Coating Lab: Contains chambers for growing thin film window coatings. Solar...

  17. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  18. Structural, optical and electrical characterization of ITO, ITO/Ag and ITO/Ni transparent conductive electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Ali, Ahmad Hadi, E-mail: ahadi@uthm.edu.my [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Penang (Malaysia); Science Department, Faculty of Science, Technology and Human Development, Universiti Tun Hussein Onn Malaysia, Johor (Malaysia); Shuhaimi, Ahmad [Low Dimensional Materials Research Centre, Department of Physics, Faculty of Science, Universiti Malaya, Kuala Lumpur (Malaysia); Hassan, Zainuriah [Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Penang (Malaysia)

    2014-01-01

    We report on the transparent conductive oxides (TCO) characteristics based on the indium tin oxides (ITO) and ITO/metal thin layer as an electrode for optoelectronics device applications. ITO, ITO/Ag and ITO/Ni were deposited on Si and glass substrate by thermal evaporator and radio frequency (RF) magnetron sputtering at room temperature. Post deposition annealing was performed on the samples in air at moderate temperature of 500 °C and 600 °C. The structural, optical and electrical properties of the ITO and ITO/metal were characterized using X-ray diffraction (XRD), UV–Vis spectrophotometer, Hall effect measurement system and atomic force microscope (AFM). The XRD spectrum reveals significant polycrystalline peaks of ITO (2 2 2) and Ag (1 1 1) after post annealing process. The post annealing also improves the visible light transmittance and electrical resistivity of the samples. Figure of merit (FOM) of the ITO, ITO/Ag and ITO/Ni were determined as 5.5 × 10{sup −3} Ω{sup −1}, 8.4 × 10{sup −3} Ω{sup −1} and 3.0 × 10{sup −5} Ω{sup −1}, respectively. The results show that the post annealed ITO with Ag intermediate layer improved the efficiency of the transparent conductive electrodes (TCE) as compared to the ITO and ITO/Ni.

  19. Synthesis and resistive switching behaviour of ZnMnO3 thin films with an Ag/ZnMnO3/ITO unsymmetrical structure

    Indian Academy of Sciences (India)

    Hua Wang; Shu-Ming Gao; Ji-Wen Xu; Chang-Lai Yuan; Xiao-Wen Zhang

    2015-02-01

    Single-phase MnZnO3 films were prepared on glass substrates coated with the use of indium tin oxide (ITO) as transparent bottom electrode via the sol–gel method. The effects of annealing temperature on structure, resistance switching behaviour and endurance characteristics of the ZnMnO3 films were investigated. The stable resistive switching behaviour with high resistance ratio in Ag/ZnMnO3/ITO unsymmetrical structure was observed. No second phase is detected, and the crystallinity of the MnZnO3 films is improved with the increase in annealing temperature from 350 to 400°C. The MnZnO3 films annealed at 350–450°C with an Ag/MnZnO3/ITO structure exhibit bipolar resistive switching behaviour. Ohmic and space-charge-limited conductions are the dominant mechanisms at low and high resistance states, respectively. $V{}_{\\text{ON}},\\ \\text{V_{OFF}}$ and $R_{\\text{HRS}}/R_{\\text{LRS}}$ of theMnZnO3 films increase with the increase in annealing temperature. Improved endurance characteristics are observed in the samples annealed at 350 and 400°C. The endurance of the MnZnO3 films degrades when annealed at >450°C.

  20. Optical and electrical properties of electrochemically deposited polyaniline/CeO2 hybrid nanocomposite film

    Institute of Scientific and Technical Information of China (English)

    Anees A. Ansari; M. A. M. Khan; M. Naziruddin Khan; Salman A. Alrokayan; M. Alhoshan; M. S. Alsalhi

    2011-01-01

    This paper reports the optical and electrical properties of electrochemically deposited polyaniline (PANI)/cerium oxide (CeO2) hybrid nano-composite film onto indium-fin-oxide (ITO) glass substrate. UV-visible spectroscopy and I-V characteristic were performed to study the optical and electrical parameters of the electrochemically deposited film. The film exhibited a strong absorption below 400 nm (3.10 eV) with a well defined absorbance peak at around 285 nm (4.35 eV). The estimated band gap of the CeO2 sample was 3.44 eV, higher than bulk CeO2 powder (Eg = 3.19 eV) due to the quantum confinement effect. Optical and electrochemical characteristics indicated that the electrical properties of PANI/CeO2 hybrid nanocomposite film are dominated by PANI doping.

  1. High-Rate Vapor Deposition of Cadmium Telluride Films for Solar Cells

    Science.gov (United States)

    Khan, Nasim Akhter

    1992-01-01

    High rate vapor deposition is presently used for large scale low cost deposition of thin films for packaging and other applications. The feasibility of using this technology for low cost deposition of solar cells was explored. After an exhaustive literature survey, the cadmium telluride (CdTe) solar cell was found to be most suitable candidate for high rate vapor deposition. The high rate vapor deposition was investigated by sublimation with a short distance between sublimation source and the substrate (Close-Spaced Sublimation, CSS). Cadmium telluride (CdTe) solar cells were fabricated by depositing CdTe films at different rates on cadmium sulphide (CdS) films deposited by CSS or by evaporation. The CdTe films deposited at higher deposition rates were observed to have open circuit voltages (V_{ rm oc}) comparable to those deposited at lower rates. The effect of CdS film which acts as window layer for the cells were also investigated on the V_ {rm oc} of the solar cells. The results achieved proved the fact that CdS window layer is necessary to achieve higher V_{ rm oc} from solar cells. The substrate temperature during deposition of films by close space sublimation plays a vital role in the performance of solar cell. The increase in the substrate temperature during deposition of CdTe films increased the V_{rm oc} of solar cells. The solar cells with indium tin oxide (ITO) as top conductor, i.e. ITO/CdS/CdTe configuration were fabricated at rates up to 34 mum/minute and with tin oxide (TO) i.e. TO/CdTe configuration fabricated at rates up to 79 mum/minute have shown similar V_{rm oc} compared to those produced at lower rates. Higher CdTe film deposition rates are possible with larger capacity experimental setup. The method of contacting CdTe, used in this study, results in higher series resistance. An improved method of contacting CdTe needs to be developed.

  2. Flexibility of the Indium Tin Oxide Transparent Conductive Film Deposited Onto the Plastic Substrate

    Directory of Open Access Journals (Sweden)

    Shao-Kai Lu

    2014-03-01

    Full Text Available In this study, we utilize the RF magnetron sputtering system to deposit the indium tin oxide (ITO conductive transparent film with low resistivity and high light transmittance to the polyethylene tetephthalate (PET plastic substrate and measure the film’s bending property and reliability at different tensile/compressive strain bending curvatures as well as the flexibility after cycling bending. The results show that the critical curvatures corresponded to the significant increase in the resistance of the 150 nm-thick ITO film deposited onto the PET substrate under tensile and compressive stress areO 14.1 mm and 5.4 mm, respectively. By observing the film’s surface crack and morphology, we can further discover that the critical curvature of the crack generated when the film is bent is quite consistent with the critical curvature at which the conductivity property degrades, and the film can withstand a higher compressive strain bending. In addition, the resistance and adhesion behavior of the film almost is unchanged after cycling bent for 1000 times with the curvature below the critical curvature.

  3. 退火温度对ITO薄膜微结构和光电特性的影响%Effect of Annealing Temperature on the Microstructure and Photoelectrical Properties of ITO Films

    Institute of Scientific and Technical Information of China (English)

    江锡顺; 万东升; 宋学萍; 孙兆奇

    2011-01-01

    用直流磁控溅射法制备了氧化铟锡(ITO)透明导电薄膜.制备出的薄膜在大气环境下退火,退火温度分别为100℃、200℃、300℃和400℃,保温时间为1h.采用X射线衍射仪(XRD)、X射线光电子能谱仪(XPS)、紫外-可见光分光光度计和四探针测试仪等测试手段分别对薄膜的微结构、化学组分和光电特性进行了测试分析.分析结果表明:Sn元素已经溶入In2O3晶格中形成了固溶体.退火温度的升高,有助于提高ITO薄膜中Sn原子氧化程度,从而提高了薄膜在可见光范围内的透射率.退火温度为200℃时ITO薄膜的性能指数最高,为4.56×10-3 Ω-1.%Indium-tin-oxide (ITO) films were prepared by direct current ( DC) magnetron sputtering. After deposition, the films were annealed in air for 1. 0 h at different temperatures (100-400 ℃). The microstructure, chemical composition and photoelectric properties of the films were analyzed by X-ray Diffraction ( XRD) , Transmission Electron Microscopy ( TEM) , X-ray Photoelectron Spectroscopy ( XPS) , Ultraviolet-Visible Spectrophotometer and four-point probe instrument. Microstructure analysis showed that the films still keep the bixbyite crystal structure as In2O3. No existence of Sn or Sn oxide diffraction peaks suggests that Sn has been introduced into In2O3 lattice, forming polycrystalline ITO. The photoelectrical property analysis shows that after annealing the ITO films represent excellent transparent and conductive performance: figure of merit increases to 4. 56 × 10-3 Ω-1 at 200 ℃.

  4. A comparative study of dip coating and spray pyrolysis methods for synthesizing ITO nanolayers by using Ag colloidal sol

    Science.gov (United States)

    Rajabi, Negar; Heshmatpour, Felora; Malekfar, Rasoul; Bahari-Poor, Hamid-Reza; Abyar, Selda

    2014-01-01

    Indium tin oxide (ITO) films were deposited on glass substrates by dip-coating and thermal pyrolysis methods. Sn (IV) is often used in the spray method as a precursor salt, but in this research we have employed a new procedure that uses Sn (II) and In(NO3)3 for preparation of transparent conductive thin films. Then, colloidal Ag was deposited on the ITO layers in order to compare the two synthesis methods, and the structural and electrical properties of the resultant films were investigated by FESEM, XRD, and four-terminal resistometry. The obtained films are polycrystalline with a preferred orientation of (200). The XRD patterns of the films indicate that in both films, the Sn phase is crystallized separately from In2O3. The presence of a Sn peak and the overall low intensity of XRD peaks suggest relative crystallization of ITO structure. For this reason, Ag films were deposited by dip coating method using a colloidal sol. By analyzing the XRD patterns of Ag-ITO films after eliminating the Sn peak, the increased intensity of the peaks confirmed the relatively good crystallization of the ITO films. The results show that the films with a sheet resistance as low as 2 × 10-2 Ω·cm, which is beneficial for solar cells, were achieved.

  5. Effect of nitrogen incorporation on the structural, optical and dielectric properties of reactive sputter grown ITO films

    Energy Technology Data Exchange (ETDEWEB)

    Gartner, M.; Stroescu, H. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Marin, A., E-mail: alexmarin@icf.ro [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Osiceanu, P. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Anastasescu, M., E-mail: manastasescu@icf.ro [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Stoica, M.; Nicolescu, M.; Duta, M.; Preda, S. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Aperathitis, E.; Pantazis, A.; Kampylafka, V. [FORTH-IESL, Crete (Greece); Modreanu, M. [Tyndall National Institute, University College Cork, Cork (Ireland); Zaharescu, M. [Institute of Physical Chemistry “Ilie Murgulescu”, Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania)

    2014-09-15

    Highlights: • Graded optical model for ITON films is presented. • ITON thin films retain an amorphous structure even after RTA at 500 °C in N{sub 2} ambient. • The lowest resistivity was 2 × 10{sup −3} Ω cm for films deposited in 75%N{sub 2} and RTA at 500 °C. • Films deposited in 75% N{sub 2} and RTA at 500 °C have degenerate semiconductor behavior. • Chemical composition before and after RTA has been analyzed by XPS depth profiling. - Abstract: The changes in the optical, microstructural and electrical properties, following the nitrogen incorporation into indium tin oxide thin films are investigated. The films are formed by r.f. sputtering from an indium-tin-oxide (80% In{sub 2}O{sub 3}–20% SnO{sub 2}) target in a mixture of Ar and N{sub 2} plasma (75% N{sub 2}–25% Ar and 100% N{sub 2} respectively) on fused silica glass substrate. The impact of rapid thermal annealing (up to 500 °C, in N{sub 2} ambient) on the properties of indium tin oxynitride (ITON) thin films is also reported. The UV–vis–NIR ellipsometry (SE) characterization of ITON films was performed assuming several realistic approaches based on various oscillator models, using a chemical composition gradient depth profiling, in agreement with the X-ray photoelectron spectroscopy measurements. The Hall measurements show that the ITON films prepared by r.f. sputtering in 75% N{sub 2} and annealed at 500 °C behave as degenerate semiconductors. X-ray diffraction analysis proved that ITON thin films retain an amorphous structure even after RTA at 500 °C in N{sub 2} ambient and atomic force microscopy showed the formation of continuous and smooth ITON thin films, with a morphology consisting in quasispherical nanometric particles.

  6. Liquid phase deposition of electrochromic thin films

    Energy Technology Data Exchange (ETDEWEB)

    Richardson, Thomas J.; Rubin, Michael D.

    2000-08-18

    Thin films of titanium, zirconium and nickel oxides were deposited on conductive SnO2:F glass substrates by immersion in aqueous solutions. The films are transparent, conformal, of uniform thickness and appearance, and adhere strongly to the substrates. On electrochemical cycling, TiO2, mixed TiO2-ZrO2, and NiOx films exhibited stable electrochromism with high coloration efficiencies. These nickel oxide films were particularly stable compared with films prepared by other non-vacuum techniques. The method is simple, inexpensive, energy efficient, and readily scalable to larger substrates.

  7. Perovskite Thin Films via Atomic Layer Deposition

    KAUST Repository

    Sutherland, Brandon R.

    2014-10-30

    © 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

  8. Perovskite thin films via atomic layer deposition.

    Science.gov (United States)

    Sutherland, Brandon R; Hoogland, Sjoerd; Adachi, Michael M; Kanjanaboos, Pongsakorn; Wong, Chris T O; McDowell, Jeffrey J; Xu, Jixian; Voznyy, Oleksandr; Ning, Zhijun; Houtepen, Arjan J; Sargent, Edward H

    2015-01-01

    A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3 NH3 PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm(-1) .

  9. Photoelectrocatalytic oxidation of GMP on an ITO electrode modified with clay/[Ru(phen)2(dC18bpy)]2+ hybrid film

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    An indium tin oxide (ITO) electrode modified with monolayer clay/[Ru(phen)2(dC18bpy)]2+ (phen= 1,10-phenanthroline, dC18bpy = 4,4′-dioctadecyl-2,2′ bipyridyl) hybrid film has been fabricated by the Langmuir-Blodgett (LB) method. Atomic force microscopy revealed that the single-layered hybrid film of clay/[Ru(phen)2(dC18bpy)]2+ (denoted as Clay-Ru) was closely packed at a surface pressure of 25 mN-m-1 and had a thickness of 3.4±0.5 nm. Cyclic voltammograms showed that the redox current of Ru(Ⅱ) complex decreased when incorporated into the clay film, suggesting that the clay layer acts as a barrier against electron transfer. When applied to oxidizing the mononucleotide of guanosine 5′-monophosphate (GMP), a large catalytic oxidative current was achieved on the Clay-Ru(Ⅱ) modified ITO electrode at the external potential above 900 mV (vs. Ag|AgCl|KCl ) and, more significantly, this response was further enhanced by light irradiation (λ>360 nm), in which the photocurrent is increased about 11 times in comparison with that of a bare ITO. Mechanism of the photoelectrocatalytic effect was proposed in terms of the reduction of the photoelectrochemically generated Ru(Ⅲ) complex in the Clay-Ru film by GMP.

  10. Photoelectrocatalytic oxidation of GMP on an ITO electrode modified with clay/[Ru(phen)2(dC 18bpy)]2+hybrid film

    Institute of Scientific and Technical Information of China (English)

    CHANG Xue-Qin; WANG Shun; LIN Da-Jie; GUAN Wei-Peng; ZHOU Huan; HUANG Shao-Ming

    2009-01-01

    An indium tin oxide (ITO) electrode modified with monolayer clay/[Ru(phen)2(dC18bpy)]2+ (phen= 1,10-phenanthroline, dC18bpy = 4,4'-dioctsdecyl-2,2' bipyridyl) hybrid film has been fabricated by the Langmuir-Blodgett (LB) method. Atomic force microscopy revealed that the single-layered hybrid film of clay/[Ru(phen)2(dC18bpy)]2+. (denoted as Clay-Ru) was closely packed at a surface pressure of 25 Ru(Ⅱ) complex decreased when incorporated into the clay film, suggesting that the clay layer acts as a barrier against electron transfer. When applied to oxidizing the mononucleotide of guanosine 5'-monophosphate (GMP), a large catalytic oxidative current was achieved on the Clay-Ru(Ⅱ) modified ITO electrode at the external potential above 900 mV (vs. AglAgCIlKCI) and, more significantly, this response was further enhanced by light irradiation (λ360 nm), in which the photocurrent is increased about 11 times in comparison with that of a bare ITO. Mechanism of the photoelectrocatalytic effect was proposed in terms of the reduction of the photoelectrochemically generated Ru(Ⅲ) complex in the Clay-Ru film by GMP.

  11. Design of an ultra-compact electro-absorption modulator comprised of a deposited TiN/HfO₂/ITO/Cu stack for CMOS backend integration.

    Science.gov (United States)

    Zhu, Shiyang; Lo, G Q; Kwong, D L

    2014-07-28

    An ultra-compact electro-absorption (EA) modulator operating around 1.55-μm telecom wavelengths is proposed and theoretically investigated. The modulator is comprised of a stack of TiN/HfO2ITO/Cu conformally deposited on a single-mode stripe waveguide to form a hybrid plasmonic waveguide (HPW). Since the thin ITO layer can behave as a semiconductor, the stack itself forms a MOS capacitor. A voltage is applied between the Cu and TiN layers to change the electron concentration of ITO (NITO), which in turn changes its permittivity as well as the propagation loss of HPW. For a HPW comprised of a Cu/3-nm-ITO/5-nm-HfO2/5-nm-TiN stack on a 400-nm × 340-nm-Si stripe waveguide, the propagation loss for the 1.55-μm TE (TM) mode increases from 1.6 (1.4) to 23.2 (23.9) dB/μm when the average NITO in the 3-nm ITO layer increases from 2 × 10(20) to 7 × 10(20) cm(-3), which is achieved by varying the voltage from -2 to 4 V if the initial NITO is 3.5 × 10(20) cm(-3). As a result, a 1-μm-long EA modulator inserted in the 400-nm × 340-nm-Si stripe waveguide exhibits insertion loss of 2.9 (3.2) dB and modulation depth of 19.9 (15.2) dB for the TE (TM) mode. The modulation speed is ~11 GHz, limited by the RC delay, and the energy consumption is ~0.4 pJ/bit. The stack can also be deposited on a low-index-contrast waveguide such as Si3N4. For example, a 4-μm-long EA modulator inserted in an 800-nm × 600-nm-Si3N4 stripe waveguide exhibits insertion loss of 6.3 (3.5) dB and modulation depth of 16.5 (15.8) dB for the TE (TM) mode. The influences of the ITO, TiN, HfO2 layers and the beneath dielectric core, as well as the processing tolerance, on the performance of the proposed EA modulator are systematically investigated.

  12. Electrochemical Rectification of Redox Mediators Using Porphyrin-Based Molecular Multilayered Films on ITO Electrodes.

    Science.gov (United States)

    Civic, Marissa R; Dinolfo, Peter H

    2016-08-10

    Electrochemical charge transfer through multilayer thin films of zinc and nickel 5,10,15,20-tetra(4-ethynylphenyl) porphyrin constructed via copper(I)-catalyzed azide-alkyne cycloaddition (CuAAC) "click" chemistry was examined. Current rectification toward various outer-sphere redox probes is revealed with increasing numbers of layers, as these films possess insulating properties over the neutral potential range of the porphyrin, then become conductive upon reaching its oxidation potential. Interfacial electron transfer rates of mediator-dye interactions toward [Co(bpy)3](2+), [Co(dmb)3](2+), [Co(NO2-phen)3](2+), [Fe(bpy)3](2+), and ferrocene (Fc), all outer-sphere redox species, were measured by hydrodynamic methods. The ability to modify electroactive films' interfacial electron transfer rates, as well as current rectification toward redox species, has broad applicability in a number of devices, particularly photovoltaics and photogalvanics.

  13. Hard Carbon Films Deposited under Various Atmospheres

    Science.gov (United States)

    Wei, M.-K.; Chen, S.-C.; Wu, T. C.; Lee, Sanboh

    1998-03-01

    Using a carbon target ablated with an XeCl-excimer laser under various gas atmospheres at different pressures, hard carbon was deposited on silicon, iron and tungsten carbide substrates. The hardness, friction coefficient, and wear rate of the film against steel are better than pure substrate material, respectively, so that it has potential to be used as a protective coating for micromechanical elements. The influences of gas pressure, gas atmosphere, and power density of laser irradiation on the thermal stability of film were analyzed by means of Raman-spectroscope, time-of-flight method, and optical emission spectrum. It was found that the film deposited under higher pressure has less diamond-like character. The film deposited under rest gas or argon atmosphere was very unstable and looked like a little graphite-like character. The film deposited at high vacuum (10-5 mbar rest gas) was the most stable and looked like the most diamond-like character. The film deposited at higher power density was more diamond-like than that at lower power density.

  14. Porous nanostructured ZnO films deposited by picosecond laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Sima, Cornelia [University of Bucharest, Faculty of Physics, 405 Atomistilor, P.O. Box MG-11, 077125, Bucharest-Magurele (Romania); National Institute for Laser, Plasma and Radiation Physics, Laser Department, 409 Atomistilor, P.O. Box MG-36, 077125, Bucharest-Magurele (Romania); Grigoriu, Constantin, E-mail: grigoriu@ifin.nipne.ro [National Institute for Laser, Plasma and Radiation Physics, Laser Department, 409 Atomistilor, P.O. Box MG-36, 077125, Bucharest-Magurele (Romania); Besleaga, Cristina; Mitran, Tudor; Ion, Lucian; Antohe, Stefan [University of Bucharest, Faculty of Physics, 405 Atomistilor, P.O. Box MG-11, 077125, Bucharest-Magurele (Romania)

    2012-08-20

    Highlights: Black-Right-Pointing-Pointer We deposite porous nanostructured ZnO films by picoseconds laser ablation (PLA). Black-Right-Pointing-Pointer We examine changes of the films structure on the experimental parameter deposition. Black-Right-Pointing-Pointer We demonstrate PLA capability to produce ZnO nanostructured films free of particulates. - Abstract: Porous nanostructured polycrystalline ZnO films, free of large particulates, were deposited by picosecond laser ablation. Using a Zn target, zinc oxide films were deposited on indium tin oxide (ITO) substrates using a picosecond Nd:YVO{sub 4} laser (8 ps, 50 kHz, 532 nm, 0.17 J/cm{sup 2}) in an oxygen atmosphere at room temperature (RT). The morpho-structural characteristics of ZnO films deposited at different oxygen pressures (150-900 mTorr) and gas flow rates (0.25 and 10 sccm) were studied. The post-deposition influence of annealing (250-550 Degree-Sign C) in oxygen on the film characteristics was also investigated. At RT, a mixture of Zn and ZnO formed. At substrate temperatures above 350 Degree-Sign C, the films were completely oxidized, containing a ZnO wurtzite phase with crystallite sizes of 12.2-40.1 nm. At pressures of up to 450 mTorr, the porous films consisted of well-distinguished primary nanoparticles with average sizes of 45-58 nm, while at higher pressures, larger clusters (3.1-14.7 {mu}m) were dominant, leading to thicker films; higher flow rates favored clustering.

  15. Chemical structure of extracted copper from scrap Cu/ITO thin films in a room temperature ionic liquid containing iodine/iodide

    Science.gov (United States)

    Huang, Hsin-Liang; Huang, Hsin-Hung; Wei, Yu Jhe

    2016-05-01

    A RTIL (room temperature ionic liquid) containing iodine/iodide (RTIL-I) was studied to determine its coated copper extraction efficiency on the surface of scrap Cu/indium tin oxide (ITO) thin films. According to the X-ray absorption near edge structural spectra and transmission electron microscopy observations, about 95% of Cu with the size of 80 nm was stripped from scrap Cu/ITO thin film into the RTIL-I and then formed 90 nm of α-CuI and CuI2- within 30 min at 298 K. The 31P NMR (nuclear magnetic resonance) spectra suggests [PF6]- of the RTIL-I may enhance the extraction of nanoparticles into the RTIL-I.

  16. Electroluminescence and photoluminescence of conjugated polymer films prepared by plasma enhanced chemical vapor deposition of naphthalene

    CERN Document Server

    Rajabi, Mojtaaba; Firouzjah, Marzieh Abbasi; Hosseini, Seyed Iman; Shokri, Babak

    2012-01-01

    Polymer light-emitting devices were fabricated utilizing plasma polymerized thin films as emissive layers. These conjugated polymer films were prepared by RF Plasma Enhanced Chemical Vapor Deposition (PECVD) using naphthalene as monomer. The effect of different applied powers on the chemical structure and optical properties of the conjugated polymers was investigated. The fabricated devices with structure of ITO/PEDOT:PSS/ plasma polymerized Naphthalene/Alq3/Al showed broadband Electroluminescence (EL) emission peaks with center at 535-550 nm. Using different structural and optical tests, connection between polymers chemical structure and optical properties under different plasma powers has been studied. Fourier transform infrared (FTIR) and Raman spectroscopies confirmed that a conjugated polymer film with a 3-D cross-linked network was developed. By increasing the power, products tended to form as highly cross-linked polymer films. Photoluminescence (PL) spectra of plasma polymers showed different excimerc ...

  17. Electrical bistable characteristics of poly (phenylene sulfide) thin film deposited by thermal evaporation

    Institute of Scientific and Technical Information of China (English)

    GUO XiaoChun; DONG GuiFang; QIU Yong

    2007-01-01

    Poly(phenylene sulfide) (PPS) is a well-known organic insulator. However, the PPS thin film, deposited by thermal evaporation in vacuum, showed electrical bistable characteristics. The structure of the PPS thin-film device was glass/ITO/PPS (300 nm)/Au. The thin film can be converted to a high conductance state by applying a pulse of 80 V (5 s), and brought back to a low conductance state by applying a pulse of 100 V (5 s). This kind of thin film is potential for active layer of a memory device. The critical voltage of the device is about 40 V, while the read-out voltage is 5 V. We tentatively ascribe the bistable phenomenon to the charge transfer from S to C atoms in the PPS molecule chains.

  18. Hydrogen related phenomena at the ITO/a-Si:H/Si heterojunction solar cell interfaces

    Energy Technology Data Exchange (ETDEWEB)

    Ulyashin, Alexander [SINTEF Materials and Chemistry, Forskningsveien 1, P.O. Box 124, 0314 Oslo (Norway); Sytchkova, Anna [Optical Coatings Laboratory, ENEA Casaccia C.R.E., via Anguillarese 301, 00123 Rome (Italy)

    2013-04-15

    Properties of thin a-Si:H and indium-tin oxide (ITO) layers as well as properties of interfaces of Si based heterojunction (HJ) ITO/(p)a-Si:H/n-Si structures were analyzed by means of atomic force microscopy (AFM) and scanning spreading resistance microscopy. It is shown that the morphology of thin ITO layers grown on n-type polished crystalline Si or on (p)a-Si:H/n-Si substrates depends on the deposition temperature and has peculiarities on nano-scale. Formation of highly conductive nano-dots on the surface and in the bulk of ITO layers is found. The observed nano-spots and nano-dots are attributed to the influence of hydrogen initiated reduction process, which occurs upon deposition of ITO films on an a-Si:H layer during the fabrication process of a HJ solar cell. This fact is confirmed by investigation of morphological properties of ITO surfaces after treatment by hydrogen plasma. It is shown that formation of conductive nano-particles on the ITO surface initiated by hydrogen does not change essentially transparency of an ITO layer. It is concluded that conductive nano-dots at the ITO/a-Si:H interface can be considered as local conductive channels, which provide a current flow through the ITO/(p)a-Si:H interface without essential shadowing of the solar cell structure. This finding opens an interesting way for the optimization of properties of the ITO/Si-based HJ solar cells. (Copyright copyright 2013 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  19. Pulsed laser deposition of tantalum pentoxide film

    Science.gov (United States)

    Zhang, J.-Y.; Boyd, I. W.

    We report thin tantalum pentoxide (Ta2O5) films grown on quartz and silicon substrates by the pulsed laser deposition (PLD) technique employing a Nd:YAG laser (wavelength λ=532 nm) in various O2 gas environments. The effect of oxygen pressure, substrate temperature, and annealing under UV irradiation using a 172-nm excimer lamp on the properties of the grown films has been studied. The optical properties determined by UV spectrophotometry were also found to be a sensitive function of oxygen pressure in the chamber. At an O2 pressure of 0.2 mbar and deposition temperatures between 400 and 500 °C, the refractive index of the films was around 2.18 which is very close to the bulk Ta2O5 value of 2.2, and an optical transmittance around 90% in the visible region of the spectrum was obtained. X-ray diffraction measurements showed that the as-deposited films were amorphous at temperatures below 500 °C and possessed an orthorhombic (β-Ta2O5) crystal structure at temperatures above 600 °C. The most significant result of the present study was that oxygen pressure could be used to control the composition and modulate optical band gap of the films. It was also found that UV annealing can significantly improve the optical and electrical properties of the films deposited at low oxygen pressures (<0.1 mbar).

  20. Deposition and Characterization of Zinc Oxide Films

    Directory of Open Access Journals (Sweden)

    Seniye KARAKAYA

    2014-07-01

    Full Text Available Zinc oxide (ZnO is suitable for optoelectronic applications due to its electrical and optical properties. The present work deals with the preparation and characterization of ZnO films deposited by the ultrasonic spray pyrolysis method. The starting solution was zinc acetate. Effects of substrate temperature on films properties have been investigated. Optical properties of the films have been characterized by investigating transmittance, absorbance and photoluminescence (PL spectra. Optical transmission spectrum shows that ZnO films have high transmission (about 80% in visible region for substrate temperatures at 350oC. Surface morphology of the films has also been analyzed by atomic force microscope (AFM. Four probes conductivity measurements have been used for electrical characterization. The resistivity of ZnO films increases with increasing substrate temperatures

  1. High quality antireflective ZnS thin films prepared by chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tec-Yam, S.; Rojas, J.; Rejon, V. [Centro de Investigacion y de Estudios Avanzados del IPN, Unidad Merida, Departamento de Fisica Aplicada, Km. 6 Antigua Carretera a Progreso, AP 73-Cordemex, 97310 Merida Yucatan (Mexico); Oliva, A.I., E-mail: oliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados del IPN, Unidad Merida, Departamento de Fisica Aplicada, Km. 6 Antigua Carretera a Progreso, AP 73-Cordemex, 97310 Merida Yucatan (Mexico)

    2012-10-15

    Zinc sulfide (ZnS) thin films for antireflective applications were deposited on glass substrates by chemical bath deposition (CBD). Chemical analysis of the soluble species permits to predict the optimal pH conditions to obtain high quality ZnS films. For the CBD, the ZnCl{sub 2}, NH{sub 4}NO{sub 3}, and CS(NH{sub 2}){sub 2} were fixed components, whereas the KOH concentration was varied from 0.8 to 1.4 M. Groups of samples with deposition times from 60 to 120 min were prepared in a bath with magnetic agitation and heated at 90 Degree-Sign C. ZnS films obtained from optimal KOH concentrations of 0.9 M and 1.0 M exhibited high transparency, homogeneity, adherence, and crystalline. The ZnS films presented a band gap energy of 3.84 eV, an atomic Zn:S stoichiometry ratio of 49:51, a transmittance above 85% in the 300-800 nm wavelength range, and a reflectance below 25% in the UV-Vis range. X-ray diffraction analysis revealed a cubic structure in the (111) orientation for the films. The thickness of the films was tuned between 60 nm and 135 nm by controlling the deposition time and KOH concentration. The incorporation of the CBD-ZnS films into ITO/ZnS/CdS/CdTe and glass/Mo/ZnS heterostructures as antireflective layer confirms their high optical quality. -- Highlights: Black-Right-Pointing-Pointer High quality ZnS thin films were prepared by chemical bath deposition (CBD). Black-Right-Pointing-Pointer Better CBD-ZnS films were achieved by using 0.9 M-KOH concentration. Black-Right-Pointing-Pointer Reduction in the reflectance was obtained for ZnS films used as buffer layers.

  2. Iron films deposited on porous alumina substrates

    Science.gov (United States)

    Yamada, Yasuhiro; Tanabe, Kenichi; Nishida, Naoki; Kobayashi, Yoshio

    2016-12-01

    Iron films were deposited on porous alumina substrates using an arc plasma gun. The pore sizes (120 - 250 nm) of the substrates were controlled by changing the temperature during the anodic oxidation of aluminum plates. Iron atoms penetrated into pores with diameters of less than 160 nm, and were stabilized by forming γ-Fe, whereas α-Fe was produced as a flat plane covering the pores. For porous alumina substrates with pore sizes larger than 200 nm, the deposited iron films contained many defects and the resulting α-Fe had smaller hyperfine magnetic fields. In addition, only a very small amount of γ-Fe was obtained. It was demonstrated that the composition and structure of an iron film can be affected by the surface morphology of the porous alumina substrate on which the film is grown.

  3. Laser deposition of bimetallic island films

    Science.gov (United States)

    Kucherik, A. O.; Arakelyan, S. M.; Kutrovskaya, S. V.; Osipov, A. V.; Istratov, A. V.; Vartanyan, T. A.; Itina, T. E.

    2016-08-01

    In this work the results of a bimetallic Au-Ag structure deposition from the colloidal system by nanosecond laser radiation are presented. The formation of the extended arrays of gold and silver nanoparticles with controlled morphology is examined. We report the results of formation bimetallic islands films with various electrical and optical properties. The changes in the optical properties of the obtained thin films are found to depend on their morphology.

  4. Electrochemical deposition of conductive and adhesive polypyrrole-dopamine films

    OpenAIRE

    Semin Kim; Jang, Lindy K.; Park, Hyun S.; Jae Young Lee

    2016-01-01

    Electrode surfaces have been widely modified with electrically conductive polymers, including polypyrrole (PPY), to improve the performance of electrodes. To utilize conductive polymers for electrode modification, strong adhesion between the polymer films and electrode substrates should be ensured with high electrical/electrochemical activities. In this study, PPY films were electrochemically polymerized on electrodes (e.g., indium tin oxide (ITO)) with dopamine as a bio-inspired adhesive mol...

  5. Optical Properties and Electrochemical Performance of LiFePO4 Thin Films Deposited on Transparent Current Collectors.

    Science.gov (United States)

    Lee, HyunSeok; Yim, Haena; Kim, Kwang-Bum; Choi, Ji-Won

    2015-11-01

    LiFePO4 thin film cathodes are deposited on various transparent conducting oxide thin films on glass, which are used as cathode current collectors. The XRD patterns show that the thin films have the phase of LiFePO4 with an ordered olivine structure indexed to the orthorhombic Pmna space group. LiFePO4 thin film deposited on various TCO glass substrates exhibits transmittance of about 53%. The initial specific discharge capacities of LiFePO4 thin films are 25.0 μAh/cm2 x μm on FTO, 33.0 μAh/cm2 x μm on ITO, and 13.0 μAh/cm2 x μm on AZO coated glass substrates. Interestingly, the retention capacities of LiFePO4 thin films are 76.0% on FTO, 31.2% on ITO, and 37.7% on AZO coated glass substrates at 20th cycle. The initial specific discharge capacity of the LiFePO4/FTO electrode is slightly lower, but the discharge capacities of the LiFePO4/FTO electrode relatively decrease less than those of the others such as LiFePO4/ITO and LiFePO4/AZO with cycling. The results reported here provide the high transparency of LiFePO4 thin films cathode materials and the good candidate as FTO current collector of the LiFePO4 thin film cathode of transparent thin film rechargeable batteries due to its high transparency and cyclic retention.

  6. Physical Vapor Deposition of Thin Films

    Science.gov (United States)

    Mahan, John E.

    2000-01-01

    A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam

  7. Understanding the mechanisms that change the conductivity of damaged ITO-coated polymeric films: A micro-mechanical investigation

    KAUST Repository

    Nasr Saleh, Mohamed

    2014-11-01

    Degradation from mechanical loading of transparent electrodes made of indium tin oxide (ITO) endangers the integrity of any material based on these electrodes, including flexible organic solar cells. However, how different schemes of degradation change the conductivity of ITO devices remains unclear. We propose a systematic micro-mechanics-based approach to clarify the relationship between degradation and changes in electrical resistance. By comparing experimentally measured channel crack densities to changes in electrical resistance returned by the different micro-mechanical schemes, we highlight the key role played by the residual conductivity in the interface between the ITO electrode and its substrate after delamination. We demonstrate that channel cracking alone does not explain the experimental observations. Our results indicate that delamination has to take place between the ITO electrode and the substrate layers and that the residual conductivity of this delaminated interface plays a major role in changes in electrical resistance of the degraded device. © 2014 Elsevier B.V.

  8. Indium-tin oxide thin films deposited at room temperature on glass and PET substrates: Optical and electrical properties variation with the H{sub 2}–Ar sputtering gas mixture

    Energy Technology Data Exchange (ETDEWEB)

    Álvarez-Fraga, L.; Jiménez-Villacorta, F.; Sánchez-Marcos, J.; Andrés, A. de; Prieto, C., E-mail: cprieto@icmm.csic.es

    2015-07-30

    Highlights: • ITO deposition on glass and PET at room temperature by using H. • High transparency and low resistance is obtained by tuning the H. • The figure of merit for ITO films on PET becomes maximal for thickness near 100 nm. - Abstract: The optical and electrical properties of indium tin oxide (ITO) films deposited at room temperature on glass and polyethylene terephthalate (PET) substrates were investigated. A clear evolution of optical transparency and sheet resistance with the content of H{sub 2} in the gas mixture of H{sub 2} and Ar during magnetron sputtering deposition is observed. An optimized performance of the transparent conductive properties ITO films on PET was achieved for samples prepared using H{sub 2}/(Ar + H{sub 2}) ratio in the range of 0.3–0.6%. Moreover, flexible ITO-PET samples show a better transparent conductive figure of merit, Φ{sub TC} = T{sup 10}/R{sub S}, than their glass counterparts. These results provide valuable insight into the room temperature fabrication and development of transparent conductive ITO-based flexible devices.

  9. Role of the buffer solution in the chemical deposition of CdS films for CIGS solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Sooho; Kim, Donguk; Baek, Dohyun; Hong, Byoungyou; Yi, Junsin; Lee, Jaehyeong [Sungkyunkwan University, Suwon (Korea, Republic of); Park, Yongseob [Chosun College of Science and and Technology, Gwangju (Korea, Republic of); Choi, Wonseok [Hanbat National University, Daejeon (Korea, Republic of)

    2014-05-15

    In this work, the effects of NH{sub 4}Ac on the structural and the electro-optical properties of CdS films were investigated. CdS thin films were deposited on soda-lime glass and indium-tin-oxide (ITO) coated glass from a chemical bath containing 0.025 M cadmium acetate, 0 M ∼ 0.2 M ammonium acetate, 0.5 M thiourea, and ammonia. Cadmium acetate was the cadmium source, ammonium acetate served as a buffer, ammonia was the complexing agent, and thiourea was the source of sulfur. A commonly- available chemical bath deposition system was successfully modified to obtain precise control over the pH of the solution at 75 .deg. C during the deposition. Chemically deposited CdS films were studied by using field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), optical transmittance, and electrical resistivity measurements.

  10. Optically optimal wavelength-scale patterned ITO/ZnO composite coatings for thin film solar cells

    CERN Document Server

    Moreau, Antoine; Centeno, Emmanuel; Seassal, Christian

    2012-01-01

    A new methodology is proposed for finding structures that are, optically speaking, locally optimal : a physical analysis of much simpler structures is used to constrain the optimization process. The obtained designs are based on a flat amorphous silicon layer (to minimize recombination) with a patterned anti-reflective coating made of ITO or ZnO, or a composite ITO/ZnO coating. These latter structures are realistic and present good performances despite very thin active layers.

  11. Optoelectronic properties of CuPc thin films deposited at different substrate temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Della Pirriera, M; Puigdollers, J; Voz, C; Alcubilla, R [Micro and Nanotechnology Group. Dept. Enginyeria Electronica, Universitat Politecnica Catalunya, 08034 Barcelona (Spain); Stella, M; Bertomeu, J [Dep. Fisica Aplicada i Optica. Universitat de Barcelona (Spain)

    2009-07-21

    Structural and optical characterization of copper phthalocyanine thin film thermally deposited at different substrate temperatures was the aim of this work. The morphology of the films shows strong dependence on temperature, as can be observed by atomic force microscopy and x-ray diffraction spectroscopy, specifically in the grain size and features of the grains. The increase in the crystal phase with substrate temperature is shown by x-ray diffractometry. Optical absorption coefficient measured by photothermal deflection spectroscopy and optical transmittance reveal a weak dependence on the substrate temperature. Besides, the electro-optical response measured by the external quantum efficiency of Schottky ITO/CuPc/Al diodes shows an optimized response for samples deposited at a substrate temperature of 60 deg. C, in correspondence to the I-V diode characteristics.

  12. Continuous, Highly Flexible, and Transparent Graphene Films by Chemical Vapor Deposition for Organic Photovoltaics

    KAUST Repository

    Gomez De Arco, Lewis

    2010-05-25

    We report the implementation of continuous, highly flexible, and transparent graphene films obtained by chemical vapor deposition (CVD) as transparent conductive electrodes (TCE) in organic photovoltaic cells. Graphene films were synthesized by CVD, transferred to transparent substrates, and evaluated in organic solar cell heterojunctions (TCE/poly-3,4- ethylenedioxythiophene:poly styrenesulfonate (PEDOT:PSS)/copper phthalocyanine/fullerene/bathocuproine/aluminum). Key to our success is the continuous nature of the CVD graphene films, which led to minimal surface roughness (∼ 0.9 nm) and offered sheet resistance down to 230 Ω/sq (at 72% transparency), much lower than stacked graphene flakes at similar transparency. In addition, solar cells with CVD graphene and indium tin oxide (ITO) electrodes were fabricated side-by-side on flexible polyethylene terephthalate (PET) substrates and were confirmed to offer comparable performance, with power conversion efficiencies (η) of 1.18 and 1.27%, respectively. Furthermore, CVD graphene solar cells demonstrated outstanding capability to operate under bending conditions up to 138°, whereas the ITO-based devices displayed cracks and irreversible failure under bending of 60°. Our work indicates the great potential of CVD graphene films for flexible photovoltaic applications. © 2010 American Chemical Society.

  13. Low Temperature DC Sputtering Deposition on Indium-Tin Oxide Film and Its Application to Inverted Top-emitting Organic Light-emitting Diodes

    Institute of Scientific and Technical Information of China (English)

    Hui LIN; Junsheng YU; Shuangling LOU; Jun WANG; Yadong JIANG

    2008-01-01

    Indium tin oxide (ITO) ultrathin films were prepared on glass substrate by DC (direct current) magnetron sputtering technique with the assistance of H2O vapor to avoid potential surface damage. The film properties were characterized by X-ray diffraction (XRD) technique, four-point probe method and spectrophotometer. The results show that the deposited ITO film with introduced H20 during sputtering process was almost amor- phous. The average visible light transmission of 100 nm ITO film was around 85% and square resistivity was below 80 Ω/square. The film was used as the transparent anode to fabricate an inverted top-emitting organic light-emitting diodes (IT-OLEDs) with the structure of glass substrate/AIq3 (40 nm)/NPB (15 nm)/CuPc(x nm)/ITO anode (100 nm), where the film thickness of CuPc was optimized. It was found that the lumi-nance of this IT-OLEDs was improved from 25 cd/m2 to more than 527 cd/m2 by increasing the thickness of CuPc, and luminance efficiency of 0.24 lm/W at 100 cd/m2 was obtained, which indicated that the optimized thickness of CuPc layer was around 15 nm.

  14. Deposition of biopolymer films on micromechanical sensors

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Gammelgaard, Lene; Jensen, Marie P.

    2011-01-01

    The influence of various parameters on the spray-coating of thin films of poly(l-lactide) (PLLA) was investigated. The optimized processing conditions were used for deposition of the biodegradable polymer on arrays of SU-8 microcantilevers. The resonance frequency of the cantilevers before and af...

  15. Flexible ITO-Free Polymer Solar Cells

    DEFF Research Database (Denmark)

    Angmo, Dechan; Krebs, Frederik C

    2013-01-01

    Indium tin oxide (ITO) is the material-of-choice for transparent conductors in any optoelectronic application. However, scarce resources of indium and high market demand of ITO have created large price fluctuations and future supply concerns. In polymer solar cells (PSCs), ITO is the single....... In this regard, replacing ITO has the potential to dramatically reduce material and processing cost and the energy payback time of PSCs. Several alternatives to ITO are present but not all of them bring competitive advantage over ITO for application in PSCs. This review explores some potentially low......-cost alternatives to ITO suitable for use in PSCs. These alternatives belong to four material groups: polymers; metal and polymer composites; metal nanowires and ultra-thin metal films; and carbon nanotubes and graphene. We further present the progress of employing these alternatives in PSCs and identify future...

  16. Physical properties of vacuum evaporated CdTe thin films with post-deposition thermal annealing

    Science.gov (United States)

    Chander, Subhash; Dhaka, M. S.

    2015-09-01

    This paper presents the physical properties of vacuum evaporated CdTe thin films with post-deposition thermal annealing. The thin films of thickness 500 nm were grown on glass and indium tin oxide (ITO) coated glass substrates employing thermal vacuum evaporation technique followed by post-deposition thermal annealing at temperature 450 °C. These films were subjected to the X-ray diffraction (XRD),UV-Vis spectrophotometer, source meter and atomic force microscopy (AFM) for structural, optical, electrical and surface morphological analysis respectively. The X-ray diffraction patterns reveal that the films have zinc-blende structure of single cubic phase with preferred orientation (111) and polycrystalline in nature. The crystallographic and optical parameters are calculated and discussed in brief. The optical band gap is found to be 1.62 eV and 1.52 eV for as-grown and annealed films respectively. The I-V characteristics show that the conductivity is decreased for annealed thin films. The AFM studies reveal that the surface roughness is observed to be increased for thermally annealed films.

  17. Pulsed laser deposition of nanostructured Ag films

    Energy Technology Data Exchange (ETDEWEB)

    Donnelly, Tony [School of Physics, Trinity College, Dublin 2 (Ireland); Doggett, Brendan [School of Physics, Trinity College, Dublin 2 (Ireland); Lunney, James G. [School of Physics, Trinity College, Dublin 2 (Ireland)]. E-mail: jlunney@tcd.ie

    2006-04-30

    Ultra-thin (0.5-5 nm) films of Ag have been prepared by pulsed laser deposition in vacuum using a 26 ns KrF excimer laser at 1 J cm{sup -2}. The deposition was controlled using a Langmuir ion probe and a quartz crystal thickness monitor. Transmission electron microscopy showed that the films are not continuous, but are structured on nanometer size scales. Optical absorption spectra showed the expected surface plasmon resonance feature, which shifted to longer wavelength and increased in strength as the equivalent film thickness was increased. It is shown that Maxwell Garnett effective medium theory can be used to calculate the main features of optical absorption spectra.

  18. A redox-active porous coordination network film based on a Ru complex as a building block on an ITO electrode.

    Science.gov (United States)

    Shinomiya, Takuya; Ozawa, Hiroaki; Mutoh, Yuichiro; Haga, Masa-Aki

    2013-12-01

    The combination of self-assembled monolayer (SAM) and layer-by-layer (LbL) growth methods for the construction of a surface porous film has the potential to incorporate a wide range of chemical functionalities on a solid surface. A novel redox-active Ru complex with 2,6-bis(N-pyridylbenzimidazolyl)-pyridine ligands (Ru complex 1), in which four peripheral pyridine groups act as coordination sites, was used as a building block for a porous coordination network film. By using (4-pyridyl)phenylphosphonic acid as a SAM primer layer on an ITO surface, the Ru complex 1 was immobilized by the successive reaction of PdCl2 on the ITO electrode in the LbL growth method. Multilayer growth was monitored by UV-vis spectra and cyclic voltammetry, in which the linear increases of both absorbance and the peak current were observed. This result indicated that the regular accumulation of Ru complex 1 onto the ITO surface took place. The permselectivity of the present porous coordination network structure was examined using redox-active molecular probes with different sizes and charges such as ferrocene, trimethylaminomethylferrocene, the Os bis(2,6-bis(N-methylbenzimidazolyl)-pyridine) complex, and tetrathiofulvarene (TTF). With the Os complex and cationic ferrocene, only the catalytic peak was observed as a prewave of the adsorbed Ru(II/III) peak at +0.73 V. On the other hand, the oxidation peak of ferrocene was observed around 0 V vs. Fc(+)/Fc even for nine-layered films in addition to the adsorbed Ru(II/III) peak. From these results, not only molecular size but also electrostatic interaction plays an important role in the permeation into the Ru complex 1 porous network film.

  19. Preparation of ITO Thin Films by Using Spin-coating Method%甩胶法制备ITO薄膜及性能研究

    Institute of Scientific and Technical Information of China (English)

    高德文; 武光明; 佟帅

    2011-01-01

    In this research, the spin-coating method is employed to prepare ITO thin films with sol-gel. Through orthogonal testing, parameters such as rotating speed, spin-coating time, drying temperature and annealing temperature have been tested, and the optimal conditions of preparation of ITO thin films by using spin-coating method has been determined. Under the optimal conditions, electrical properties, optical properties and appearance of the prepared thin films have been analyzed. The results show that the thin films have nice electrical conductivity and light transmission ability; the sheet resistance is 13 Ω/□, and the transmittance rate could reach 96%.%采用溶胶凝胶并通过甩胶制备薄膜方法制备了ITO薄膜.以转速、甩胶时间、干燥温度和退火温度为参数进行正交试验,确定了甩胶法制备ITO薄膜的最优化条件,并对最优化条件下制备的薄膜进行了电学性能、光学性能和形貌分析.结果表明:该透明导电薄膜具有良好的导电性能及透光性能,其表面方阻为13 Ω/□,可见光透过率达到了96%.

  20. Effects of annealing temperature on mechanical durability of indium-tin oxide film on polyethylene terephthalate substrate

    Energy Technology Data Exchange (ETDEWEB)

    Machinaga, Hironobu, E-mail: hironobu_machinaga@gg.nitto.co.jp; Ueda, Eri; Mizuike, Atsuko; Takeda, Yuuki; Shimokita, Keisuke; Miyazaki, Tsukasa

    2014-05-30

    Effects of the annealing temperature on mechanical durability of indium-tin oxide (ITO) thin films deposited on polyethylene terephthalate (PET) substrates were investigated. The ITO films were annealed at the range from 150 °C to 195 °C after the DC sputtering deposition for the production of polycrystalline ITO layers on the substrates. The onset strains of cracking in the annealed ITO films were evaluated by the uniaxial stretching tests with electrical resistance measurements during film stretching. The results indicate that the onset strain of cracking in the ITO film is clearly increased by increasing the annealing temperature. The in-situ measurements of the inter-planer spacing of the (222) plane in the crystalline ITO films during film stretching by using synchrotron radiation strongly suggest that the large compressive stress in the ITO film increases the onset strain of cracking in the film. X-ray stress analyses of the annealed ITO films and thermal mechanical analyses of the PET substrates also clarifies that the residual compressive stress in the ITO film is enhanced with increasing the annealing temperature due to the considerably larger shrinkage of the PET substrate. - Highlights: • Indium-tin oxide (ITO) films were deposited on polyethylene terephthalate (PET). • Mechanical durability of the ITO is improved by high temperature post-annealing. • The shrinkage in the PET increases with rising the post-annealing temperature. • The shrinkage of the PET enhances the compressive stress in the ITO film. • Large compressive stress in the ITO film may improve its mechanical durability.

  1. Preparation of dye-adsorbing ZnO thin films by electroless deposition and their photoelectrochemical properties.

    Science.gov (United States)

    Nagaya, Satoshi; Nishikiori, Hiromasa

    2013-09-25

    Dye-adsorbing ZnO thin films were prepared on ITO films by electroless deposition. The films were formed in an aqueous solution containing zinc nitrate, dimethylamine-borane, and eosin Y at 328 K. The film thickness was 1.2-2.0 μm. Thinner and larger-plane hexagonal columns were produced from the solution containing a higher concentration of eosin Y. A photocurrent was observed in the electrodes containing such ZnO films during light irradiation. The photoelectrochemical performance of the film was improved by increasing the concentration of eosin Y because of increases in the amount of absorbed photons and the electronic conductivity of ZnO.

  2. Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films

    OpenAIRE

    2013-01-01

    Electrodeposition technique was employed to deposit cuprous oxide Cu2O thin films. In this work, Cu2O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2O thin films was investigated.

  3. Annealing Effect of Pulsed Laser Deposited Transparent Conductive Ta-Doped Titanium Oxide Films

    Institute of Scientific and Technical Information of China (English)

    WU Bin-Bin; PAN Feng-Ming; YANG Yu-E

    2011-01-01

    Tantalum-doped TiO2 Rilms were deposited on glass at 300℃PG by pulsed laser deposition (PLD). After post-annealing in vacuum (~10-4 Pa) at temperatures ranging from 450℃ to 650℃, these films were crystallized into an anatase TiO2 structure and presented good conductive features. With increasing annealing temperature up to 550℃, the resistivity of the films was measured to be around 8.7 x 10-4 Ω·cm. Such films exhibit high transparency of over 80% in the visible light region. These results indicate that tantalum-doped anatase TiO2 films have a great potential as transparent conducting oxides.%Tantalum-doped TiO2 films were deposited on glass at 300℃ by pulsed laser deposition (PLD).After postannealing in vacuum (~10-4 Pa) at temperatures ranging from 450℃ to 650℃,these films were crystallized into an anatase TiO2 structure and presented good conductive features.With increasing annealing temperature up to 550℃,the resistivity of the films was measured to be around 8.7 × 10-4 Ω·cm.Such films exhibit high transparency of over 80% in the visible light region.These results indicate that tantalum-doped anatase TiO2 films have a great potential as transparent conducting oxides.Transparent conducting oxides (TCOs) have received much attention both in fundamental research and device applications due to their good combination of high electrical conductivity and excellent optical transparency.[1] Among various TCOs,indium tin oxide (ITO) is considered as the most beneficial TCO due to its excellent properties:low resistivity (~10-4 Ω·cm),high optical transmittance (80-90%)and simple preparation process.[2] However,due to the scarcity and high cost of indium,ITO may not be able to satisfy the demands in the future.Hence,it is necessary to explore new candidates of TCOs for expanding application usage.

  4. Silicon carbide and other films and method of deposition

    Science.gov (United States)

    Mehregany, Mehran (Inventor); Zorman, Christian A. (Inventor); Fu, Xiao-An (Inventor); Dunning, Jeremy (Inventor)

    2011-01-01

    A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.

  5. Pulsed laser deposition of ferroelectric thin films

    Science.gov (United States)

    Sengupta, Somnath; McKnight, Steven H.; Sengupta, Louise C.

    1997-05-01

    It has been shown that in bulk ceramic form, the barium to strontium ratio in barium strontium titanium oxide (Ba1- xSrxTiO3, BSTO) affects the voltage tunability and electronic dissipation factor in an inverse fashion; increasing the strontium content reduces the dissipation factor at the expense of lower voltage tunability. However, the oxide composites of BSTO developed at the Army Research Laboratory still maintain low electronic loss factors for all compositions examined. The intent of this study is to determine whether such effects can be observed in the thin film form of the oxide composites. The pulsed laser deposition (PLD) method has been used to deposit the thin films. The different compositions of the compound (with 1 wt% of the oxide additive) chosen were: Ba0.3Sr0.7TiO3, Ba0.4Sr0.6TiO3, Ba0.5Sr0.5TiO3, Ba0.6Sr0.4TiO3, and Ba0.7Sr0.3TiO3. The electronic properties investigated in this study were the dielectric constant and the voltage tunability. The morphology of the thin films were examined using the atomic force microscopy. Fourier transform Raman spectroscopy was also utilized for optical characterization of the thin films. The electronic and optical properties of the thin films and the bulk ceramics were compared. The results of these investigations are discussed.

  6. VUV-light-induced deposited silica films

    Science.gov (United States)

    Buck, Christopher K.; Pedraza, Anthony J.; Benson, Roberto S.; Park, Jae-Won

    1998-05-01

    A novel technique to deposit dielectric films at room temperature is described. The deposition of the silica takes place inside a cylindrical glass chamber where a silent discharge is generated between two electrodes connected to a high voltage, high frequency AC source. The chamber contains two parallel glass tubes where the electrodes are located and is filled with argon or xenon at a pressure of 100 mbar. Under these conditions, it has been shown that high intensity VUV light is generated peaking at 126 nm for argon and at 172 nm for xenon. This VUV radiation seems to produce photoablation of the glass tubes that surround the electrodes. Upon operation of the lamp, polyimide, polypropylene and silicon wafer substrates lying at the bottom of the vessel became coated with silica. The films, identified using X-ray photoelectron spectroscopy (XPS), revealed that the silica is oxygen-deficient with a composition of SiO x where x is between 1.7 and 1.8. The deposition rate on silicon wafers was measured by ellipsometry. When Xe gas is used the deposition rate is much lower than when Ar is used. This result is consistent with a photoablation process since the energy of the photons generated in Ar peaks at 10 eV while those generated in Xe peaks at 7 eV. These energy values should be compared with the O-Si bond strength energy that is 8.3 eV. The morphology and structure of the films were examined by scanning and transmission electron microscopies. Deposition of carbonaceous films occurred when the glass tubes containing the electrodes were coated with carbon.

  7. Effects of complexing agents on electrochemical deposition of FeS x O y thin films

    Science.gov (United States)

    Supee, Aizuddin; Ichimura, Masaya

    2016-08-01

    FeS x O y thin films were deposited on indium-tin-oxide (ITO)-coated glass substrates at 15 °C via galvanostatic electrochemical deposition from an aqueous solution containing 100 mM Na2S2O3 and 30 mM FeSO4. The effects of l(+)-tartaric acid (C4H4O6) and lactic acid [CH3CH(OH)COOH] at different concentrations were investigated. All the deposited films were amorphous. With the complexing agents, the thickness was increased, and the oxygen content was reduced significantly compared with the sample deposited without the complexing agents. In the photoelectrochemical measurement, p-type conductivity was confirmed. The photoresponsivity was not influenced significantly by the complexing agent, suggesting that the oxygen content does not drastically affect the properties of the deposited films probably because the local bonding configuration around Fe atoms in FeS x O y is similar to that in FeS2.

  8. Indium Tin Oxide-Magnesium Fluoride Co-Deposited Films for Spacecraft Applications

    Science.gov (United States)

    Dever, Joycer A.; Rutledge, Sharon K.; Hambourger, Paul D.; Bruckner, Eric; Ferrante, Rhea; Pal, Anna Marie; Mayer, Karen; Pietromica, Anthony J.

    1998-01-01

    Highly transparent coatings with a maximum sheet resistivity between 10(exp 8) and 10(exp 9) ohms/square are desired to prevent charging of solar arrays for low Earth polar orbit and geosynchronous orbit missions. Indium tin oxide (ITO) and magnesium fluoride (MgF2) were ion beam sputter co-deposited onto fused silica substrates and were evaluated for transmittance, sheet resistivity and the effects of simulated space environments including atomic oxygen (AO) and vacuum ultraviolet (VUV) radiation. Optical properties and sheet resistivity as a function of MgF2 content in the films will be presented. Films containing 8.4 wt.% MgF2 were found to be highly transparent and provided sheet resistivity in the required range. These films maintained a high transmittance upon exposure to AO and to VUV radiation, although exposure to AO in the presence of charged species and intense electromagnetic radiation caused significant degradation in film transmittance. Sheet resistivity of the as-fabricated films increased with time in ambient conditions. Vacuum beat treatment following film deposition caused a reduction in sheet resistivity. However, following vacuum heat treatment, sheet resistivity values remained stable during storage in ambient conditions.

  9. Discussion on testing method of ITO film sheet resistance%ITO薄膜方块电阻测试方法的探讨

    Institute of Scientific and Technical Information of China (English)

    关自强

    2014-01-01

    For the testing method of ITO film sheet resistance , the article discusses the adaptability and accuracy of regular four-point probe testing method and dual-configuration four-point probe testing method in actual production and makes necessary elaboration for details at the time of testing sheet resistance according to different characteristics of structure and physical property of ITO film on glass substrate and polyester film. And detailed description for considerations for testing of sheet resistance during production was made at the same time.%针对ITO薄膜方块电阻测试方法,文章探讨了常规的四探针法与双电测四探针法在实际生产中的适应性、准确性。根据玻璃基板上的 ITO薄膜和聚脂薄膜上的ITO薄膜的结构、物理特性不同特点,测试方块电阻时应注意的细节作出了必要的阐述。并对生产中有关方块电阻测试的注意事项作出详细说明。

  10. Pulsed laser deposition of pepsin thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kecskemeti, G. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary)]. E-mail: kega@physx.u-szeged.hu; Kresz, N. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary); Smausz, T. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Hopp, B. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Nogradi, A. [Department of Ophthalmology, University of Szeged, H-6720, Szeged, Koranyi fasor 10-11 (Hungary)

    2005-07-15

    Pulsed laser deposition (PLD) of organic and biological thin films has been extensively studied due to its importance in medical applications among others. Our investigations and results on PLD of a digestion catalyzing enzyme, pepsin, are presented. Targets pressed from pepsin powder were ablated with pulses of an ArF excimer laser ({lambda} = 193 nm, FWHM = 30 ns), the applied fluence was varied between 0.24 and 5.1 J/cm{sup 2}. The pressure in the PLD chamber was 2.7 x 10{sup -3} Pa. The thin layers were deposited onto glass and KBr substrates. Our IR spectroscopic measurements proved that the chemical composition of deposited thin films is similar to that of the target material deposited at 0.5 and 1.3 J/cm{sup 2}. The protein digesting capacity of the transferred pepsin was tested by adapting a modified 'protein cube' method. Dissolution of the ovalbumin sections proved that the deposited layers consisted of catalytically active pepsin.

  11. Deposition and characterization of CuInS2 thin films deposited over copper thin films

    Science.gov (United States)

    Thomas, Titu; Kumar, K. Rajeev; Kartha, C. Sudha; Vijayakumar, K. P.

    2015-06-01

    Simple, cost effective and versatile spray pyrolysis method is effectively combined with vacuum evaporation for the deposition of CuIns2 thin films for photovoltaic applications. In the present study In2s3 was spray deposited over vacuum evaporated Cu thin films and Cu was allowed to diffuse in to the In2S3 layer to form CuInS2. To analyse the dependence of precursor volume on the formation of CuInS2 films structural, electrical and morphological analzes are carried out. Successful deposition of CuInS2thin films with good crystallinity and morphology with considerably low resistivity is reported in this paper.

  12. Deposition of low sheet resistance indium tin oxide directly onto functional small molecules

    Energy Technology Data Exchange (ETDEWEB)

    Franklin, Joseph B., E-mail: martyn.mclachlan@imperial.ac.uk; Fleet, Luke R.; Burgess, Claire H.; McLachlan, Martyn A.

    2014-11-03

    We outline a methodology for depositing tin-doped indium oxide (ITO) directly onto semiconducting organic small molecule films for use as a transparent conducting oxide top-electrode. ITO films were grown using pulsed laser deposition onto copper(II)phthalocyanine (CuPc):buckminsterfullerene (C{sub 60}) coated substrates. The ITO was deposited at a substrate temperature of 150 °C over a wide range of background oxygen pressures (P{sub d}) (0.67–10 Pa). Deposition at 0.67 ≤ P{sub d} ≤ 4.7 Pa led to delamination of the organic films owing to damage induced by the high energy ablated particles, at intermediate 4.7 ≤ P{sub d} < 6.7 Pa pressures macroscopic cracking is observed in the ITO. Increasing P{sub d} further, ≥ 6.7 Pa, supports the deposition of continuous, polycrystalline and highly transparent ITO films without damage to the CuPc:C{sub 60}. The free carrier concentration of ITO is strongly influenced by P{sub d}; hence growth at > 6.7 Pa induces a significant decrease in conductivity; with a minimum sheet resistance (R{sub s}) of 145 Ω/□ achieved for 300 nm thick ITO films. To reduce the R{sub s} a multi-pressure deposition was implemented, resulting in the formation of polycrystalline, highly transparent ITO with an R{sub s} of ∼ 20 Ω/□ whilst maintaining the inherent functionality and integrity of the small molecule substrate. - Highlights: • Indium tin oxide (ITO) deposited directly onto molecular semiconductor thin-films. • Oxygen is shown to influence ITO resistivity and multilayer morphology. • Damage was prevented by modifying pulsed laser deposition growth conditions. • Low sheet resistance, highly transparent ITO deposition was demonstrated.

  13. Transparent ITO/Ag-Pd-Cu/ITO multilayer cathode use in inverted organic solar cells

    Science.gov (United States)

    Kim, Hyo-Joong; Lee, Hyun Hwi; Kal, Jinha; Hahn, Jungseok; Kim, Han-Ki

    2015-10-01

    The characteristics of transparent ITO/Ag-Pd-Cu (APC)/ITO multilayer cathodes were investigated for use in inverted organic solar cells (IOSCs). The insertion of an APC interlayer into the ITO film effectively led to crystallization of the top ITO layer, unlike that in the Ag interlayer, and resulted in a low sheet resistance of 6.55 Ohm/square and a high optical transmittance of 84.14% without post annealing. In addition, the alloying of the Pd and Cu elements into Ag prevented agglomeration and oxidization of the metal interlayer and led to more stable ITO/APC/ITO films under ambient conditions. The microstructure and interfacial structure of the transparent ITO/APC/ITO cathode in the IOSCs were examined in detail by synchrotron X-ray scattering and high resolution transmission electron microscopy. Furthermore, we suggested a possible mechanism to explain the lower PCE of the IOSCs with an ITO/APC/ITO cathode than that of a reference IOSC with a crystalline ITO cathode using the external quantum efficiency of the IOSCs.

  14. Transparent ITO/Ag-Pd-Cu/ITO multilayer cathode use in inverted organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyo-Joong; Kim, Han-Ki, E-mail: imdlhkkim@khu.ac.kr [Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, 1 Seocheon-dong, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of); Lee, Hyun Hwi [Pohang Accelerator Laboratory, POSTECH, Jigokro-127beon-gil, Nam-gu, Pohang 790-784 (Korea, Republic of); Kal, Jinha; Hahn, Jungseok [Future Technology Research Group, Kolon Central Research Park, 154 Mabukro, Giheung-ku, Yongin-si, Kyunggi-do, 16910 (Korea, Republic of)

    2015-10-15

    The characteristics of transparent ITO/Ag-Pd-Cu (APC)/ITO multilayer cathodes were investigated for use in inverted organic solar cells (IOSCs). The insertion of an APC interlayer into the ITO film effectively led to crystallization of the top ITO layer, unlike that in the Ag interlayer, and resulted in a low sheet resistance of 6.55 Ohm/square and a high optical transmittance of 84.14% without post annealing. In addition, the alloying of the Pd and Cu elements into Ag prevented agglomeration and oxidization of the metal interlayer and led to more stable ITO/APC/ITO films under ambient conditions. The microstructure and interfacial structure of the transparent ITO/APC/ITO cathode in the IOSCs were examined in detail by synchrotron X-ray scattering and high resolution transmission electron microscopy. Furthermore, we suggested a possible mechanism to explain the lower PCE of the IOSCs with an ITO/APC/ITO cathode than that of a reference IOSC with a crystalline ITO cathode using the external quantum efficiency of the IOSCs.

  15. Transparent ITO/Ag-Pd-Cu/ITO multilayer cathode use in inverted organic solar cells

    Directory of Open Access Journals (Sweden)

    Hyo-Joong Kim

    2015-10-01

    Full Text Available The characteristics of transparent ITO/Ag-Pd-Cu (APC/ITO multilayer cathodes were investigated for use in inverted organic solar cells (IOSCs. The insertion of an APC interlayer into the ITO film effectively led to crystallization of the top ITO layer, unlike that in the Ag interlayer, and resulted in a low sheet resistance of 6.55 Ohm/square and a high optical transmittance of 84.14% without post annealing. In addition, the alloying of the Pd and Cu elements into Ag prevented agglomeration and oxidization of the metal interlayer and led to more stable ITO/APC/ITO films under ambient conditions. The microstructure and interfacial structure of the transparent ITO/APC/ITO cathode in the IOSCs were examined in detail by synchrotron X-ray scattering and high resolution transmission electron microscopy. Furthermore, we suggested a possible mechanism to explain the lower PCE of the IOSCs with an ITO/APC/ITO cathode than that of a reference IOSC with a crystalline ITO cathode using the external quantum efficiency of the IOSCs.

  16. A comparative study of thin films of Zn(O;OH)S and In(O;OH)S deposited on CuInS2 by chemical bath deposition method

    Science.gov (United States)

    Vallejo, W.; Quiñones, C.; Gordillo, G.

    2012-04-01

    In this work, a study of synthesis of thin films of Zn(O;OH)S and In(O;OH)S deposited by chemical bath deposition (CBD) is presented. The thin films of Zn(O;OH)S and In(O;OH)S were deposited from different chemical bath systems on absorber layers of CuInS2 (CIS), indium tin oxide substrates (ITO) and soda lime glass substrates (SL). The differences on the growth rate, optical, morphological and structural properties of the thin films Zn(O;OH)S and In(O;OH)S are studied. The Growth studies showed that thin films of Zn(O;OH)S and In(O;OH)S grown faster on CIS than on SL and ITO substrates. The optical and morphological studies showed that both thin films present high transmittance in visible electromagnetic spectrum and covered uniformly the surface of the substrate, furthermore it was observed that thin films of Zn(O;OH)S and In(O;OH)S were polycrystalline. Finally, the results suggest that thin films of Zn(O;OH)S and In(O;OH)S obtained in this work could be used as buffer layer to replace the thin films of CdS, which are conventionally used as buffer layer in chalcopyrite based solar cells.

  17. Structural analysis of porphyrin multilayer films on ITO assembled using copper(I)-catalyzed azide-alkyne cycloaddition by ATR IR.

    Science.gov (United States)

    Palomaki, Peter K B; Dinolfo, Peter H

    2011-12-01

    We report the use of grazing-angle attenuated total reflectance (GATR) IR and polarized UV-vis to determine the molecular structure of porphyrin based molecular multilayer films grown in a layer-by-layer (LbL) fashion using copper-catalyzed azide-alkyne cycloaddition (CuAAC). The molecular orientation and bonding motif present in multilayer films of this type could impact their photophysical and electrochemical properties as well as potential applications. Multilayer films of M(II) 5,10,15,20-tetra(4-ethynylphenyl)porphyrin (1 M = Zn, 2 M = Cu) and azido based linkers 3-5 were used to fabricate the films on ITO substrates. Electrochemically determined coverage of films containing 2 match the trends observed in the absorbance. GATR-IR spectral analysis of the films indicate that CuAAC reactivity is leading to 1,4-triazole linked multilayers with increasing porphyrin and linker IR characteristic peaks. Films grown using all azido-linkers (3-5) display an oscillating trend in azide IR intensity suggesting that the surface bound azido group reacts with 1 and that further layering can occur through additional reaction with linkers, regenerating the azide surface. Films containing linker 5 in particular show an overall increase in azide content suggesting that only two of the three available groups react during multilayer fabrication, causing an overall buildup of azide content in the film. Films of 1 with linker 3 and 5 showed an average porphyrin plane angle of 46.4° with respect to the substrate as determined by GATR FT-IR. Polarized UV-vis absorbance measurements correlate well with the growth angle calculated by IR. The orientation of the porphyrin plane within the multilayer structures suggests that the CuAAC-LbL process results in a film with a trans bonding motif. © 2011 American Chemical Society

  18. Optical, structural and electrochromic properties of sputter- deposited W-Mo oxide thin films

    Science.gov (United States)

    Gesheva, K.; Arvizu, M. A.; Bodurov, G.; Ivanova, T.; Niklasson, G. A.; Iliev, M.; Vlakhov, T.; Terzijska, P.; Popkirov, G.; Abrashev, M.; Boyadjiev, S.; Jágerszki, G.; Szilágyi, I. M.; Marinov, Y.

    2016-10-01

    Thin metal oxide films were investigated by a series of characterization techniques including impedance spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, and Atomic Force Microscopy. Thin film deposition by reactive DC magnetron sputtering was performed at the Ångström Laboratory. W and Mo targets (5 cm diameter) and various oxygen gas flows were employed to prepare samples with different properties, whereas the gas pressure was kept constant at about 30 mTorr. The substrates were 5×5 cm2 plates of unheated glass pre-coated with ITO having a resistance of 40 ohm/sq. Film thicknesses were around 300 nm as determined by surface profilometry. Newly acquired equipment was used to study optical spectra, optoelectronic properties, and film structure. Films of WO3 and of mixed W- Mo oxide with three compositions showed coloring and bleaching under the application of a small voltage. Cyclic voltammograms were recorded with a scan rate of 5 mV s-1. Ellipsometric data for the optical constants show dependence on the amount of MoOx in the chemical composition. Single MoOx film, and the mixed one with only 8% MoOx have the highest value of refractive index, and similar dispersion in the visible spectral range. Raman spectra displayed strong lines at wavenumbers between 780 cm-1 and 950 cm-1 related to stretching vibrations of WO3, and MoO3. AFM gave evidence for domains of different composition in mixed W-Mo oxide films.

  19. Fabrication of Pt/ITO Thin-Film Thermocouple on Metal Substrates%金属基Pt/ITO薄膜热电偶的制备

    Institute of Scientific and Technical Information of China (English)

    赵文雅; 蒋洪川; 陈寅之; 张万里; 刘兴钊; 彭少龙; 唐磊

    2013-01-01

    采用多层膜结构制备了金属基Pt/ITO薄膜热电偶,薄膜热电偶由Ni基合金基片、NiCrAlY过渡层、热生长Al2O3层、Al2O3绝缘层、Pt/ITO功能层和Al2O3保护层构成.静态标定结果表明:样品的平均塞贝克系数为107.45 μV/℃.测试温度可达到1000℃.时效处理可以有效提高薄膜热电偶的输出热电势.%The Pt/ITO thin-film thermocouples with multilayer structure are fabricated on metal substrates. The thin-film thermocouple is composed of Ni-base alloy substrate, NiCrAlY buffer layer, thermal growth A12O3 layer, A12O3 insulating layer, Pt/ITO function layer and A12O3 protective layer. The results of the static calibration of the sample show that the average Seebeck coefficient is about 107.45 μV /℃. The test temperature can be up to 1000℃. The thermoelectric power of the sample can be effectively improved by aging treatment.

  20. Potential of ITO nanoparticles formed by hydrogen treatment in PECVD for improved performance of back grid contact crystalline silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Mandal, Sourav; Mitra, Suchismita; Dhar, Sukanta; Ghosh, Hemanta; Banerjee, Chandan, E-mail: chandanbanerjee74@gmail.com; Datta, Swapan K.; Saha, Hiranmoy

    2015-09-15

    Highlights: • Indium tin oxide (ITO) nanoparticles as back scatterers in c-Si solar cells. • ITO NP have comparatively low dissipative losses and tunable optical properties. • ITO NP formed by hydrogen plasma treatment on sputtered ITO film. • Enhanced absorption and carrier collection at longer wavelengths due to enhanced light trapping. - Abstract: This paper discusses the prospect of using indium tin oxide (ITO) nanoparticles as back scatterers in crystalline silicon solar cells instead of commonly used metal nanoparticles as ITO nanoparticles have comparatively low dissipative losses and tunable optical properties. ITO nanoparticles of ∼5–10 nm size is developed on the rear side of the solar cell by deposition of ∼5–10 nm thick ITO layer by DC magnetron sputtering followed by hydrogen treatment in PECVD. The silicon solar cell is fabricated in the laboratory using conventional method with grid metal contact at the back surface. Various characterizations like FESEM, TEM, AFM, XRD, EQE and IV characteristics are performed to analyze the morphology, chemical composition, optical characteristics and electrical performance of the device. ITO nanoparticles at the back surface of the solar cell significantly enhances the short circuit current, open circuit voltage and efficiency of the solar cell. These enhancements may be attributed to the increased absorption and carrier collection at longer wavelengths of solar spectrum due to enhanced light trapping by the ITO nanoparticles and surface passivation by the hydrogen treatment of the back surface.

  1. Electrochemical deposition of nano-structured ZnO on the nanocrystalline TiO2 film and its characterization

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    One-dimensional structure of ZnO nanorod arrays on nanocrystalline TiO2/ITO conductive glass substrates has been fabricated by cathodic reduction electrochemical deposition methods in the three-electrode system,with zinc nitrate aqueous solution as the electrolyte,and were characterized by X-ray diffraction (XRD),scanning electron microscopy (SEM),energy-dispersive X-ray (EDX) and photoluminescence (PL) spectra.The effects of film substrates,electrolyte concentration,deposition time,and methenamine (HMT) addition on ZnO deposition and its luminescent property were investigated in detail.The results show that,compared with on the ITO glass substrate,ZnO is much easily achieved by electrochemical deposition on the TiO2 nanoparticle thin films.ZnO is hexagonally structured wurtzite with the c-axis preferred growth,and further forms nanorod arrays vertically on the substrates.It is favorable to the growth of ZnO to extend the deposition time,to increase the electrolyte concentration,and to add a certain amount of HMT in the system,consequently improving the crystallinity and orientation of ZnO arrays.It is demonstrated that the obtained ZnO arrays with high crystallinity and good orientation display strong band-edge UV (375 nm) and weak surface-state-related green (520 nm) emission peaks.

  2. Research and development of photovoltaic power system. Research on low temperature deposition of polycrystalline thin films; Taiyoko hatsuden system no kenkyu kaihatsu. Teion seimaku gijutsu no kenkyu kaihatsu

    Energy Technology Data Exchange (ETDEWEB)

    Sato, K. [Tokyo Univ. of Agriculture and Technology, Tokyo (Japan). Faculty of Technology

    1994-12-01

    This paper reports the result obtained during fiscal 1994 on research on a technology of low temperature deposition of polycrystalline thin films for solar cells. This research used ITO coated glass substrates, on which CdS was accumulated to a thickness of about 100 nm by using the CBD process, and over this deposition a CuInSe2 film was formed at 300{degree}C by using the ion cluster beam (ICB) process. The manufactured solar cells with a glass/ITO/CdS/CuInSe2/Au structure had an efficiency of 2%. In manufacturing a CuGaSe2 thin film by using the ICB process, effects of acceleration voltage relative to cluster beams and ionization current were investigated. It was found that the film morphology, the result of analysis by using X-ray diffraction, and the electric conductivity are sensitive to the ionization current. From these findings, an optimum film forming condition was derived. A CuGaSe2 thin film was manufactured by using the ICB process over a Cds thin film deposited by using the CDB process. Both of the surface morphology and X-ray diffraction patterns of the film did not show a large change, indicating a possibility of manufacturing cells with a reverse structure. Effects of heat treatment on CuInSe2 monocrystals were evaluated by using ESR and FTIR. 6 figs., 1 tab.

  3. All-Solid-Thin Film Electrochromic Devices Consisting of Layers ITO / NiO / ZrO2 / WO3 / ITO

    Directory of Open Access Journals (Sweden)

    K.J. Patel

    2013-05-01

    Full Text Available We have prepared an all-solid-thin film electrochromic device (ECD, consisting of layers ITO / NiO / ZrO2 / WO3 / ITO using the PVD method. The WO3 is used as an electrochromic layer, NiO as an ion-storage layer, and ZrO2 as a solid electrolyte layer in the all-solid-thin film ECD. The optical transmittance varied between 3-59 %. The device shows the coloration and bleaching time of 120 s and 2 s, respectively, with a good memory effect and desirable cycle-life.

  4. Electrochemical deposition of molybdenum sulfide thin films on conductive plastic substrates as platinum-free flexible counter electrodes for dye-sensitized solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Cheng, Chao-Kuang; Hsieh, Chien-Kuo, E-mail: jack_hsieh@mail.mcut.edu.tw

    2015-06-01

    In this study, pulsed electrochemical deposition (pulsed ECD) was used to deposit molybdenum sulfide (MoS{sub x}) thin films on indium tin oxide/polyethylene naphthalate (ITO/PEN) substrates as flexible counter electrodes (CEs) for dye-sensitized solar cells (DSSCs). The surface morphologies and elemental distributions of the prepared MoS{sub x} thin films were examined using field-emission scanning electron microscope (FE-SEM) equipped with energy-dispersive X-ray spectroscopy. The chemical states and crystallinities of the prepared MoS{sub x} thin films were examined by X-ray photoelectron spectroscopy and X-ray diffraction, respectively. The optical transmission (T (%)) properties of the prepared MoS{sub x} samples were determined by ultraviolet–visible spectrophotometry. Cyclic voltammetry (CV) and Tafel-polarization measurements were performed to analyze the electrochemical properties and catalytic activities of the thin films for redox reactions. The FE-SEM results showed that the MoS{sub x} thin films were deposited uniformly on the ITO/PEN flexible substrates via the pulsed ECD method. The CV and Tafel-polarization curve measurements demonstrated that the deposited MoS{sub x} thin films exhibited excellent performances for the reduction of triiodide ions. The photoelectric conversion efficiency (PCE) of the DSSC produced with the pulsed ECD MoS{sub x} thin-film CE was examined by a solar simulator. In combination with a dye-sensitized TiO{sub 2} working electrode and an iodine-based electrolyte, the DSSC with the MoS{sub x} flexible CE showed a PCE of 4.39% under an illumination of AM 1.5 (100 mW cm{sup −2}). Thus, we report that the MoS{sub x} thin films are active catalysts for triiodide reduction. The MoS{sub x} thin films are prepared at room temperature and atmospheric pressure and in a simple and rapid manner. This is an important practical contribution to the production of flexible low-cost thin-film CEs based on plastic substrates. The MoS{sub x

  5. In situ spectroelectrochemical behaviour of nanocrystalline TiO2 thin films electrode fabricated by pulsed laser deposition

    Institute of Scientific and Technical Information of China (English)

    傅正文; 孔继烈; 秦启宗; 田中群

    1999-01-01

    Nanocrystalline titanium oxide thin films have been successfully deposited on ITO coated glass by pulsed laser ablation of metallic Ti target in O3/O2 ambient gases. The intercalation of Li ions in the anatase TiO2 film electrode is examined by cyclic vohammetry. The electrochromic behaviour of TiO2 electrode is investigated by in-situ visible transmittance measurement, and two absorption bands at 420 and 650 nm are observed. The absorption falling and rising in color changing with excellent revisibility is relative to the insertion and deintercalation processes of Li ion. These resuits suggest that nanocrystalline titanium oxide films fabricated by pulsed laser deposition exhibit excellent spectroelectrochemical property.

  6. Highly photoconducting O2-doped CdS films deposited by spray pyrolysis

    Science.gov (United States)

    Richards, D.; El-Korashy, A. M.; Stirn, R. J.; Karulkar, P. C.

    1984-01-01

    CdS films have been prepared by spraying in air solutions of thiourea with either cadmium chloride or cadmium acetate with varying mole ratio and substrate temperature, and subsequently heat treating in oxygen. Substrates included both bare glass or sapphire and transparent conducting oxide-coated sapphire for electrical measurements lateral and transverse to the CdS plane, respectively. Dark resistances of over 10 to the 14th ohms and light-to-dark conductivities of up to 10 to the 7th were obtained using uncoated substrates. The use of Cd(C2H3O2)2 in place of CdCl2 greatly increased the speed of response although with some sacrifice in photoconductivity. Deposition of CdS on ITO-coated surfaces led to greatly reduced dark resistances for the case of CdCl2, but not Cd(C2H3O2)2, presumably due to HCl reaction with the ITO coating in the course of spraying with the former. Ion microprobe analysis detected indium within the CdS films exhibiting low dark resistance. Measurements of the dark and light conductivities at temperatures down to 77 K are given as are the response times for unetched and HCl-etched surfaces.

  7. Annealing effects on electrical properties of pure and tin-doped indium oxide thin films.

    Science.gov (United States)

    Kato, Kazuhiro; Omoto, Hideo; Yonekura, Masaaki

    2012-12-01

    The annealing effects on the properties of ITO and pure In2O3 thin films have been investigated. The thin films were deposited with various O2 flow ratios to total gas flow by pulsed dc magnetron sputtering. The post-deposition annealing of the thin films was carried out for 30 minutes at various temperatures ranging up to 500 degrees C in air. It was found through the comparison of the carrier density of ITO and In2O3 thin films that the carrier electrons of the ITO thin films came from both of the dopant Sn and oxygen vacancies under the annealing less than 400 degrees C. Therefore, the ITO thin films deposited with lower O2 flow ratio exhibited higher carrier density due to many oxygen vacancies; in consequence, they exhibited lower resistivity at the annealing up to 400 degrees C. On the other hand, the carrier density of ITO thin films was almost identical regardless of O2 flow ratio when they were annealed at 500 degrees C. This fact indicates that most carrier electrons of the ITO thin films were brought by the dopant Sn at the annealing temperature of 500 degrees C. However, the ITO thin films deposited with lower O2 flow ratio exhibited higher Hall mobility; as a result, they showed lower resistivity at the annealing of 500 degrees C. Atomic force microscope, X-ray diffraction and X-ray reflectivity measurements revealed that the ITO thin films deposited with lowe O2 flow ratio exhibited dense structure even after they were annealed at 500 degrees C. Hence, the carrier electrons of the dense ITO thin films deposited with low O2 flow ratio can conduct better, as a result, the ITO thin films exhibited high Hall mobility and low resistivity.

  8. Photoelectrochemical performance of W-doped BiVO4 thin-films deposited by spray pyrolysis

    Science.gov (United States)

    Holland, Stephen K.; Dutter, Melissa R.; Lawrence, David J.; Reisner, Barbara A.; DeVore, Thomas C.

    2013-09-01

    The effect of tungsten doping and hydrogen annealing treatments on the photoelectrochemical (PEC) performance of bismuth vanadate (BiVO4) photoanodes for solar water splitting was studied. Thin films of BiVO4 were deposited on ITO-coated glass slides by ultrasonic spray pyrolysis of an aqueous solution containing bismuth nitrate and vanadium oxysulfate. Tungsten doping was achieved by adding either silicotungstic acid (STA) or ammonium metatungstate (AMT) in the aqueous precursor. The 1.7 μm - 2.2 μm thick films exhibited a highly porous microstructure. Undoped films that were reduced at 375 ºC in 3% H2 exhibited the largest photocurrent densities under 0.1 W cm-2 AM1.5 illumination. This performance enhancement was believed to be due to the formation of oxygen vacancies, which are shallow electron donors, in the films. Films doped with 1% or 5% tungsten from either STA or AMT exhibited reduced photoelectrochemical performance and greater sample-to-sample performance variations. Powder X-ray diffraction data of the undoped films indicated that they were comprised primarily of the monoclinic scheelite phase while unidentified phases were also present. Scanning electron microscopy showed slightly different morphology characteristics for the Wdoped films. It is surmised that the addition of W in the deposition process promoted the morphology differences and the formation of different phases, thus reducing the PEC performance of the photoanode samples. Significant PEC performance variability was also observed among films deposited using the described process.

  9. Interfacial Energy Alignment at the ITO/Ultra-Thin Electron Selective Dielectric Layer Interface and Its Effect on the Efficiency of Bulk-Heterojunction Organic Solar Cells.

    Science.gov (United States)

    Itoh, Eiji; Goto, Yoshinori; Saka, Yusuke; Fukuda, Katsutoshi

    2016-04-01

    We have investigated the photovoltaic properties of an inverted bulk heterojunction (BHJ) cell in a device with an indium-tin-oxide (ITO)/electron selective layer (ESL)/P3HT:PCBM active layer/MoOx/Ag multilayered structure. The insertion of only single layer of poly(diallyl-dimethyl-ammonium chloride) (PDDA) cationic polymer film (or poly(ethyleneimine) (PEI) polymeric interfacial dipole layer) and titanium oxide nanosheet (TN) films as an ESL effectively improved cell performance. Abnormal S-shaped curves were observed in the inverted BHJ cells owing to the contact resistance across the ITO/active layer interface and the ITO/PDDA/TN/active layer interface. The series resistance across the ITO/ESL interface in the inverted BHJ cell was successfully reduced using an interfacial layer with a positively charged surface potential with respect to ITO base electrode. The positive dipole in PEI and the electronic charge phenomena at the electrophoretic deposited TN (ED-TN) films on ITO contributed to the reduction of the contact resistance at the electrode interface. The surface potential measurement revealed that the energy alignment by the transfer of electronic charges from the ED-TN to the base electrodes. The insertion of the ESL with a large positive surface potential reduced the potential barrier for the electron injection at ITO/TN interface and it improved the photovoltaic properties of the inverted cell with an ITO/TN/active layer/MoOx/Ag structure.

  10. Strontium-Doped Lanthanum Manganite Films Prepared by Magnetic Deposition

    DEFF Research Database (Denmark)

    Menon, Mohan; Larsen, Casper; Andersen, Kjeld Bøhm

    2009-01-01

    Deposition of La0.85Sr0.15MnO3 (LSM) films from suspensions using a magnetic field was found to be a cheap and quick technique. Ninety weight percent of the particles present in the suspensions were deposited within the first minute of the deposition, and the thickness of the film varied linearly...

  11. Resonant infrared pulsed laser deposition of thin biodegradable polymer films

    DEFF Research Database (Denmark)

    Bubb, D.M.; Toftmann, B.; Haglund Jr., R.F.

    2002-01-01

    Thin films of the biodegradable polymer poly(DL-lactide-co-glycolide) (PLGA) were deposited using resonant infrared pulsed laser deposition (RIR-PLD). The output of a free-electron laser was focused onto a solid target of the polymer, and the films were deposited using 2.90 (resonant with O-H str...

  12. Stress in and texture of PVD deposited metal nitride films

    NARCIS (Netherlands)

    Machunze, R.

    2010-01-01

    Thin metal nitride films deposited by Physical Vapor Deposition (PVD) are used amongst many other applications as wear protective coatings in tool industry or as diffusion barriers in integrated circuit technology. Typically these films exhibit a residual in-plane stress when deposited onto rigid su

  13. Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)

    Energy Technology Data Exchange (ETDEWEB)

    Scarminio, Jair; Silva, Paulo Rogerio Catarini da, E-mail: scarmini@uel.br, E-mail: prcsilva@uel.br [Universidade Estadual de Londrina (UEL), PR (Brazil). Departamento de Fisica; Gelamo, Rogerio Valentim, E-mail: rogelamo@gmail.com [Universidade Federal do Triangulo Mineiro (UFTM), Uberaba, MG (Brazil); Moraes, Mario Antonio Bica de, E-mail: bmoraes@mailhost.ifi.unicamp.br [Universidade Estadual de Campinas (UNICAMP), SP (Brazil)

    2017-01-15

    Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 deg C, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 deg C the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 deg C a crystalline nonstoichiometric V{sub 2}O{sub 5} structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 deg C. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films. (author)

  14. Deposition of low sheet resistance indium tin oxide directly onto functional small molecules

    KAUST Repository

    Franklin, Joseph B.

    2014-11-01

    © 2014 Elsevier B.V. All rights reserved. We outline a methodology for depositing tin-doped indium oxide (ITO) directly onto semiconducting organic small molecule films for use as a transparent conducting oxide top-electrode. ITO films were grown using pulsed laser deposition onto copper(II)phthalocyanine (CuPc):buckminsterfullerene (C60) coated substrates. The ITO was deposited at a substrate temperature of 150 °C over a wide range of background oxygen pressures (Pd) (0.67-10 Pa). Deposition at 0.67 ≤ Pd ≤ 4.7 Pa led to delamination of the organic films owing to damage induced by the high energy ablated particles, at intermediate 4.7 ≤ Pd < 6.7 Pa pressures macroscopic cracking is observed in the ITO. Increasing Pd further, ≥ 6.7 Pa, supports the deposition of continuous, polycrystalline and highly transparent ITO films without damage to the CuPc:C60. The free carrier concentration of ITO is strongly influenced by Pd; hence growth at > 6.7 Pa induces a significant decrease in conductivity; with a minimum sheet resistance (Rs) of 145 /□ achieved for 300 nm thick ITO films. To reduce the Rs a multi-pressure deposition was implemented, resulting in the formation of polycrystalline, highly transparent ITO with an Rs of - 20/□ whilst maintaining the inherent functionality and integrity of the small molecule substrate.

  15. Experimental Study on the Relation between the Thermal Radiative Properties and Plasma Wavelength of ITO Films for Heat Mirror Applications%ITO的热辐射性质与等离子波长关系的实验研究

    Institute of Scientific and Technical Information of China (English)

    陈颉; 葛新石; 胡行方

    2000-01-01

    热镜膜具有广泛的应用背景,特别是将其沉积在柔性的黑色底衬上,就能获得不同于通常的、必须用发射率很低的金属做衬底的太阳能选择性吸收表面. 采用衬底不加温的普通RF溅射技术制备单层ITO热镜膜,并对它们的热辐射性质与等离子波长之间的关系进行了实验研究. 研究表明,对于单层ITO热镜膜,同时具有最小的发射率和最小的对太阳辐射的反射率是困难的. 但是,等离子波长可以作为预测太阳能热利用领域使用的单层ITO热镜膜热辐射性质的一个判据.%There is an increasing interest for the heat mirror films, especially, deposited on rigid or flexible black substrates used as a spectral selective absorbing coating which differs from the common selective absorber needing a metal substrate with low emissivity. The single layer indium tin oxides heat mirror films (HMF) were deposited onto unheated glass and rigid or flexible plastic substrates by conventional RF sputtering technique. The relation between the thermal radiative properties and the plasma wavelength of indium tin oxides heat mirror films were obtained based on experimental studies. The results show that it is impossible to get ITO HMF simultaneously with maximum reflectance in thermal long wavelength region and minimum reflectance in the solar spectral region. However, the plasma wavelength can be take as a criterion to predict the thermal radiative properties of ITO HMF, approximately.

  16. CdTe Films Deposited by Closed-space Sublimation

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    CdTe films are prepared by closed-space sublimation technology. Dependence of film crystalline on substrate materials and substrate temperature is investigated. It is found that films exhibit higher crystallinity at substrate temperature higher than 400℃. And the CdTe films deposited on CdS films with higher crystallinity have bigger crystallite and higher uniformity. Treatment with CdCl2 methanol solution promotes the crystallite growth of CdTe films during annealing.

  17. Energy bandgap variation in oblique angle-deposited indium tin oxide

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Kyurin; Kim, Hyunsoo; Cho, Jaehee, E-mail: jcho@chonbuk.ac.kr [School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756 (Korea, Republic of); Park, Jun Hyuk; Kim, Jong Kyu [Department of Materials Science and Engineering, Pohang University of Science and Technology, Pohang 54896 (Korea, Republic of); Fred Schubert, E. [Future Chips Constellation, Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)

    2016-01-25

    Indium tin oxide (ITO) thin films deposited using the oblique angle deposition (OAD) technique exhibit a strong correlation between structural and optical properties, especially the optical bandgap energy. The microstructural properties of ITO thin films are strongly influenced by the tilt angle used during the OAD process. When changing the tilt angle, the refractive index, porosity, and optical bandgap energy of ITO films also change due to the existence of a preferential growth direction at the interface between ITO and the substrate. Experiments reveal that the ITO film's optical bandgap varies from 3.98 eV (at normal incident deposition) to 3.87 eV (at a 60° tilt angle)

  18. New Copolymers Containing Charge Carriers for Organic Devices with ITO Films Treated by UV-Ozone Using High Intensity Discharge Lamp

    Directory of Open Access Journals (Sweden)

    Emerson Roberto SANTOS

    2009-02-01

    Full Text Available For electroluminescent devices new copolymers were synthesized using a Suzuki cross-coupling reaction based on monomers (fluorine-alt-phenylene in conjugation with quinoline-alt-phenylene units. They were characterized by 1H NMR, 13C NMR and FTIR. TGA measurements indicated that the copolymers have good thermal properties and no weight loss was observed up to 250 °C. The UV-Vis spectra were characterized by absorptions from the fluorene-alt-phenylene and quinoline-alt-phenylene segments in the backbone, while their photoluminescence (PL spectra dominated by emissions from the fluorene excimer. For devices assembly ITO films were treated using a High Intensity Discharge Lamp (HPMVL without outer bulb presenting high ozone concentration than that conventional germicidal lamp. The device with ITO treated revealed significant decrease of threshold voltage (or turn-on voltage compared by untreated with I-V curves. This decrease can be related by water and carbon dioxide extracted on surface after UV-Ozone treatment revealed by DRIFT measurements.

  19. Boron doped nanostructure ZnO films deposited by ultrasonic spray pyrolysis

    Science.gov (United States)

    Karakaya, Seniye; Ozbas, Omer

    2015-02-01

    ZnO is an II-VI compound semiconductor with a wide direct band gap of 3.3 eV at room temperature. Doped with group III elements (B, Al or Ga), it becomes an attractive candidate to replace tin oxide (SnO2) or indium tin oxide (ITO) as transparent conducting electrodes in solar cell devices and flat panel display due to competitive electrical and optical properties. In this work, ZnO and boron doped ZnO (ZnO:B) films have been deposited onto glass substrates at 350 ± 5 °C by a cost-efficient ultrasonic spray pyrolysis technique. The optical, structural, morphological and electrical properties of nanostructure undoped and ZnO:B films have been investigated. Electrical resistivity of films has been analyzed by four-probe technique. Optical properties and thicknesses of the films have been examined in the wavelength range 1200-1600 nm by using spectroscopic ellipsometry (SE) measurements. The optical constants (refractive index (n) and extinction coefficient (k)) and the thicknesses of the films have been fitted according to Cauchy model. The optical method has been used to determine the band gap value of the films. Transmission spectra have been taken by UV spectrophotometer. It is found that both ZnO and ZnO:B films have high average optical transmission (≥80%). X-ray diffraction (XRD) patterns indicate that the obtained ZnO has a hexagonal wurtzite type structure. The morphological properties of the films were studied by atomic force microscopy (AFM). The surface morphology of the nanostructure films is found to depend on the concentration of B. As a result, ZnO:B films are promising contender for their potential use as transparent window layer and electrodes in solar cells.

  20. Three-dimensionally embedded indium tin oxide (ITO) films in photosensitive glass: a transparent and conductive platform for microdevices

    Energy Technology Data Exchange (ETDEWEB)

    Beke, S.; Sugioka, K.; Midorikawa, K. [RIKEN - Advanced Science Institute, Laser Technology Laboratory, Saitama (Japan); Koroesi, L.; Dekany, I. [University of Szeged, Supramolecular and Nanostructured Materials Research Group of the Hungarian Academy of Sciences, Szeged (Hungary)

    2011-02-15

    A new method for embedding transparent and conductive two- and three-dimensional microstructures in glass is presented. We show that the internal surface of hollow structures fabricated by femtosecond-laser direct writing inside the photosensitive glass can be coated by indium tin oxide (Sn-doped In{sub 2}O{sub 3}, ITO) using a sol-gel process. The idea of combining two transparent materials with different electrical properties, i.e., insulating and conductive, is very promising and hence it opens new prospects in manufacturing cutting edge microdevices, such as lab-on-a-chips (LOCs) and microelectromechanical systems (MEMS). (orig.)

  1. Pulsed laser deposition and characterization of Alnico5 magnetic films

    Energy Technology Data Exchange (ETDEWEB)

    Butt, M.Z., E-mail: mzbutt49@yahoo.com [Department of Physics, GC University, Lahore 54000 (Pakistan); Ali, Dilawar [Department of Physics, GC University, Lahore 54000 (Pakistan); Ahmad, Fayyaz [Department of Physics, University of Engineering and Technology, Lahore 54890 (Pakistan); Magnetophotonics Research Laboratory, Department of Physics, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2013-09-01

    Alnico5 films were deposited by pulsed laser deposition on glass substrate at room temperature under a vacuum ∼10{sup −3} Torr in the absence and in the presence of 500 Oe external transverse magnetic field applied on the plasma plume during film deposition. For this purpose, Nd:YAG laser was employed to ablate the Alnico5 target. The ablated material was deposited on glass substrate placed at a distance of 2 cm from the target. The structural and magnetic properties of the film were analyzed by X-ray diffraction, atomic force microscope, and vibrating sample magnetometer. X-ray diffraction patterns showed that the Alnico5 films were amorphous in nature. Atomic force microscopy revealed that the Alnico5 film deposited in absence of external magnetic field has larger root-mean-square roughness value (60.2 nm) than the magnetically deposited film (42.9 nm). Vibrating sample magnetometer measurements showed that the in-plane saturation magnetization of Alnico5 film deposited in the presence of external magnetic field increases by 32% as compared to that for the film deposited in the absence of external magnetic field. However, the out-of-plane saturation magnetization was almost independent of the external magnetic field. In magnetically deposited film, there is in-plane anisotropy parallel to the applied external magnetic field.

  2. Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view

    CSIR Research Space (South Africa)

    Modibedi, M

    2011-09-01

    Full Text Available Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound....

  3. Control of preferred (222) crystalline orientation of sputtered indium tin oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Pham, Duy Phong [Laboratory of Advanced Materials, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam); Phan, Bach Thang [Laboratory of Advanced Materials, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam); Faculty of Materials Science, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam); Hoang, Van Dung; Nguyen, Huu Truong [Laboratory of Advanced Materials, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam); Ta, Thi Kieu Hanh [Faculty of Materials Science, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam); Maenosono, Shinya [Japan Advanced Institute of Science and Technology, Nomi, Ishikawa (Japan); Tran, Cao Vinh, E-mail: tcvinh@hcmus.edu.vn [Laboratory of Advanced Materials, University of Science, Vietnam National University, Ho Chi Minh (Viet Nam)

    2014-11-03

    We report a two-step growth process for the fabrication of (222)-plane textured indium tin oxide (ITO) films. A thin ITO seed layer was grown in mixed Argon + Oxygen gases, followed by a thick ITO deposited in Argon gas. X-Ray diffraction shows that the sputtered ITO films exhibit strongly preferred (222) crystalline orientation. The (222)-plane textured ITO films have high transmittance above 80% in the visible range and carrier concentration, mobility and resistivity in the range of 10{sup 21} cm{sup −3}, 40 cm{sup 2}/Vs and 10{sup −4} Ω·cm, respectively. The surface roughness of our (222) textured ITO films is 1.4 nm, which is one of the smallest value obtained from sputtered ITO thin films. - Highlights: • Control of preferred (222) crystalline orientation of indium tin oxide (ITO) films • A thin oxygen rich seed layer activates (222) orientation growth of overhead ITO films. • The surface roughness of (222)-plane textured ITO films is about 1.4 nm. • Carrier concentration and resistivity are about 10{sup 21} cm{sup −3} and 10{sup −4} Ω·cm, respectively.

  4. Development of A Novel Methode for COD (Chemical Oxygen Demand Measurement based onPhotoelectrochemical Cell: Characterization of TiO2/ITO Film Working Electrode

    Directory of Open Access Journals (Sweden)

    Y.K. Krisnandi

    2009-04-01

    Full Text Available Nanosize TiO2 film,immobilized on an ITO (Indium Tin Oxide glass, was successfully fabricated. The film was prepared by a dip coatingtechnique in a hydrothermal sol-gel system and subjected to a heat treatment at 100°C up to 450°C. Characterization ofthe film by XRD, AFM, BET methods revealed the occurrence of anatase form and 9.64 nm in crystallite size; havingthree dimensional profile and roughness with height of typically 9.8 nm; and surface area of 58.21 m2/g. The film thenwas employed as a working electrode in a photo electrochemical system (PES. This PES generated a photocurrent thatproportional to the organic chemical concentration in the water sample. Integration of the photocurrent versus timegives a charge (Q that represent the event of complete mineralization of organic chemical in the TiO2 surface and canbe correlated to the Chemical Oxygen Demand (COD of measured water. This system has a potential to be developedfor a novel COD sensor.

  5. The mechanical properties of thin alumina film deposited by metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Gellings, P.J.; Vendel, van de D.; Metselaar, H.S.C.; Corbach, van H.D.; Fransen, T.

    1995-01-01

    Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low and atmospheric pressures. The effects of deposition temperature, growth rate and film thickness on the mechanical pro

  6. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  7. Room-Temperature Deposition of NbN Superconducting Films

    Science.gov (United States)

    Thakoor, S.; Lamb, J. L.; Thakoor, A. P.; Khanna, S. K.

    1986-01-01

    Films with high superconducting transition temperatures deposited by reactive magnetron sputtering. Since deposition process does not involve significantly high substrate temperatures, employed to deposit counter electrode in superconductor/insulator/superconductor junction without causing any thermal or mechanical degradation of underlying delicate tunneling barrier. Substrates for room-temperature deposition of NbN polymeric or coated with photoresist, making films accessible to conventional lithographic patterning techniques. Further refinements in deposition technique yield films with smaller transition widths, Tc of which might approach predicted value of 18 K.

  8. Impedimetric Sensing Proprieties of ITO Electrodes Functionalized with PEDOT:PSS/Azo-Calix[4]Arene for the Detection of Al3+ Ions Under Light Excitation

    Science.gov (United States)

    Echabaane, M.; Rouis, A.; Mahjoub, M. A.; Bonnamour, I.; Ben Ouada, H.

    2016-08-01

    This study describes an investigation of the sensitivity of the azo-calix[4]arene/poly(3,4-ethylenedioxythiophene)/poly-(styrenesulfonate) (PEDOT:PSS) thin film deposited on the indium tin oxide (ITO) electrode surface toward aluminum ions (Al3+) under light excitation. Thin films were deposited by the spin-coating technique. Adhesion of these films to the ITO surface was highlighted by performing contact angle measurements. Then, interfaces of the azo-calix[4]arene/PEDOT:PSS thin film were characterized by impedance measurements using electrochemical impedance spectroscopy. Obtained impedance spectra were fitted using an equivalent circuit. Finally, evolutions of the different components of this circuit were studied. These evolutions show that the sensitivity of the azo-calix[4]arene/PEDOT:PSS/ITO electrode is remarkably improved under illumination.

  9. Impedimetric Sensing Proprieties of ITO Electrodes Functionalized with PEDOT:PSS/Azo-Calix[4]Arene for the Detection of Al3+ Ions Under Light Excitation

    Science.gov (United States)

    Echabaane, M.; Rouis, A.; Mahjoub, M. A.; Bonnamour, I.; Ben Ouada, H.

    2017-01-01

    This study describes an investigation of the sensitivity of the azo-calix[4]arene/poly(3,4-ethylenedioxythiophene)/poly-(styrenesulfonate) (PEDOT:PSS) thin film deposited on the indium tin oxide (ITO) electrode surface toward aluminum ions (Al3+) under light excitation. Thin films were deposited by the spin-coating technique. Adhesion of these films to the ITO surface was highlighted by performing contact angle measurements. Then, interfaces of the azo-calix[4]arene/PEDOT:PSS thin film were characterized by impedance measurements using electrochemical impedance spectroscopy. Obtained impedance spectra were fitted using an equivalent circuit. Finally, evolutions of the different components of this circuit were studied. These evolutions show that the sensitivity of the azo-calix[4]arene/PEDOT:PSS/ITO electrode is remarkably improved under illumination.

  10. Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henley, W.B.; Sacks, G.J. [Univ. of South Florida, Tampa, FL (United States). Center of Microelectronics

    1997-03-01

    Use of plasma-enhanced chemical vapor deposition (PECVD) for electrochromic WO{sub 3} film deposition is investigated. Oxygen, hydrogen, and tungsten hexafluoride were used as source gases. Reactant gas flow was investigated to determine the effect on film characteristics. High quality optical films were obtained at deposition rates on the order of 100 {angstrom}/s. Higher deposition rates were attainable but film quality and optical coherence degraded. Atomic emission spectroscopy (AES), was used to provide an in situ assessment of the plasma deposition chemistry. Through AES, it is shown that the hydrogen gas flow is essential to the deposition of the WO{sub 3} film. Oxygen gas flow and tungsten hexafluoride gas flow must be approximately equal for high quality films.

  11. Low-temperature and solution-processed indium tin oxide films and their applications in flexible transparent capacitive pressure sensors

    Energy Technology Data Exchange (ETDEWEB)

    Yu, Jian; Ye, Zhizhen [Zhejiang University, State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Hangzhou (China); Chen, Sujie; Guo, Xiaojun [Shanghai Jiao Tong University, Department of Electronic Engineering, Shanghai (China); Wang, Nana [Nanjing Tech University (NanjingTech), Institute of Advanced Materials (IAM), Jiangsu National Synergistic Innovation Center for Advanced Materials SICAM, Nanjing (China); Qi, Hang [Zhejiang University, Center for Chemistry of High-Performance and Novel Materials, Department of Chemistry, Hangzhou (China); Jin, Yizheng [Zhejiang University, State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Hangzhou (China); Zhejiang University, Center for Chemistry of High-Performance and Novel Materials, Department of Chemistry, Hangzhou (China)

    2016-04-15

    It is of great interest to fabricate indium tin oxide (ITO) films by solution-based techniques at low temperatures. Here, we combined the use of colloidal ITO nanoflowers synthesized by the strategy of limited ligand protection and oxygen plasma treatment which effectively remove the surface ligands of ITO nanocrystals to meet this goal. These efforts led to high-quality ITO films with resistivity as low as 2.33 x 10{sup -2} Ωcm, which is the best result for solution-processed ITO nanocrystal films deposited at temperatures lower than 200 C. The annealing-free processing allowed us to deposit ITO nanoflower films onto plastic substrates and apply them in flexible capacitive pressure sensors. The single-pixel device showed decent sensitivity and reproducibility, and the arrayed sensors exhibited good spatial resolution. (orig.)

  12. On the uniformity of films fabricated by glancing angle deposition

    Science.gov (United States)

    Wakefield, Nicholas G.; Sit, Jeremy C.

    2011-04-01

    Films fabricated using the glancing angle deposition technique are subject to significant variations in several important film parameters across a sample due to geometric conditions that are not uniform across the substrate. This paper presents a method to quantify the non-uniformities in these quantities, starting from a generalized geometric framework, for low-pressure, physical vapor deposition of thin films on substrates of arbitrary size and position. This method is applicable to any glancing angle deposition setup including substrate tilt and rotation but focuses on the case of constant deposition angle and arbitrary azimuthal rotation. While some quantities, such as the effective deposition angle and the deposited mass per unit area at any given point on the substrate can be determined purely from the geometry of the deposition setup, obtaining further quantities, such as the film density and thickness, requires additional, material-specific information that is easily measured.

  13. Bifunctional MoO3-WO3/Ag/MoO3-WO3 Films for Efficient ITO-Free Electrochromic Devices.

    Science.gov (United States)

    Dong, Wenjie; Lv, Ying; Xiao, Lili; Fan, Yi; Zhang, Nan; Liu, Xingyuan

    2016-12-14

    Dielectric-metal-dielectric (DMD) trilayer films, served as both electrochromic (EC) film and transparent conductor (TC), have exhibited great potential application in low-cost, ITO-free electrochromic devices (ECDs). However, recent reports on the DMD-based ECDs revealed that the response time and the optical modulation properties were not very satisfactory. Here, the mixed MoO3-WO3 materials were first introduced as the dielectric layer to construct an EC-TC bifunctional MoO3-WO3/Ag/MoO3-WO3 (MWAMW) film, which demonstrates strong and broad-band optical modulation in the visible light region, fast color-switching time (2.7 s for coloration and 4.1 s for bleaching), along with high coloration efficiency (70 cm(2) C(-1)). The electrical structure and electrochemical reaction kinetics analysis revealed that the improved EC performances are associated with the increased electron intervalence transition together with the fast charge-transfer and ion-diffusion dynamics.

  14. Characterization of copper selenide thin films deposited by chemical bath deposition technique

    Science.gov (United States)

    Al-Mamun; Islam, A. B. M. O.

    2004-11-01

    A low-cost chemical bath deposition (CBD) technique has been used for the preparation of Cu2-xSe thin films onto glass substrates and deposited films were characterized by X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and UV-vis spectrophotometry. Good quality thin films of smooth surface of copper selenide thin films were deposited using sodium selenosulfate as a source of selenide ions. The structural and optical behaviour of the films are discussed in the light of the observed data.

  15. ZnO thin films prepared by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tsoutsouva, M.G. [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Panagopoulos, C.N., E-mail: chpanag@metal.ntua.gr [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Papadimitriou, D. [National Technical University of Athens, Department of Physics, GR-15780 Athens (Greece); Fasaki, I.; Kompitsas, M. [Theor. and Phys./Chem. Institute, National Hellenic Research Foundation, 48 Vas. Konstantinou Ave., 11635 Athens (Greece)

    2011-04-15

    Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by pulsed laser deposition (PLD) in an oxygen-reactive atmosphere. The structural, optical, and electrical properties of the as-prepared thin films were studied in dependence of substrate temperature and oxygen pressure. High quality polycrystalline ZnO films with hexagonal wurtzite structure were deposited at substrate temperatures of 100 and 300 deg. C. The RMS roughness of the deposited oxide films was found to be in the range 2-9 nm and was only slightly dependent on substrate temperature and oxygen pressure. Electrical measurements indicated a decrease of film resistivity with the increase of substrate temperature and the decrease of oxygen pressure. The ZnO films exhibited high transmittance of 90% and their energy band gap and thickness were in the range 3.26-3.30 eV and 256-627 nm, respectively.

  16. Ion Beam Assisted Deposition Of Optical Thin Films - Recent Results

    Science.gov (United States)

    McNally, J. J.; Al-Jumaily, G. A.; Wilson, S. R.; McNeil, J. R.

    1985-11-01

    We have examined the properties of dielectric (Ti02, Si02, -Al203, Ta205 and Hf02) films deposited using ion-assisted deposition (IAD). The films were characterized using an angularly resolved scatterometer, spectrophotometer and Raman spectroscopy. A reduction in optical scatter, especially that due to low spatial frequencies, is observed for films deposited with simultaneous ion bombardment. Higher values of refractive index are obtained for films deposited using IAD. Raman spectra indicate a crystalline phase change in TiO2 films is induced by bombardment of samples with 02 ions during deposition. Other experimental data and the effects of the induced phase transition on the optical properties of TiO2 will be discussed.

  17. Solution deposition of nanometer scale silver films as an alternative to vapor deposition for plasmonic excitation

    Energy Technology Data Exchange (ETDEWEB)

    Smith, Derek S.; Sathish, R. Sai; Kostov, Yordan [Center for Advanced Sensor Technology and Department of Chemical and Biochemical Engineering, University of Maryland Baltimore County, 1000 Hilltop Circle, Baltimore, MD 21250 (United States); Rao, Govind, E-mail: grao@umbc.ed [Center for Advanced Sensor Technology and Department of Chemical and Biochemical Engineering, University of Maryland Baltimore County, 1000 Hilltop Circle, Baltimore, MD 21250 (United States)

    2010-05-03

    We report the attainment of surface plasmon-coupled emission (SPCE) from highly uniform thin silver films, solution-deposited on glass substrates by a wet chemistry approach. The surface morphology of these films was characterized by atomic force microscopy. The SPCE emission enhancements, polarization and angularity obtained from solution-deposited silver on BK7 glass were comparable to that achieved from conventional SPCE slides prepared via vapor deposition. This facile, wet chemistry procedure for the deposition of SPCE films provides an inexpensive, low maintenance alternative to vapor deposition for SPCE substrate preparation. This would allow the fluorescence observation technique to become more readily available for high sensitivity, low cost applications.

  18. Influence of substrate temperature on growth of a-Si:H films by reactive facing target sputtering deposition

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    Hydrogenated amorphous silicon(a-Si:H) films were deposited by reactive facing target sputtering(FTS) technique with a mixture of Ar and H2 reaction gas.Fourier transform infrared(FTIR) absorption,Raman scattering and ultraviolet-visible optical absorption are used to investigate the microstructure and optical properties of the deposited films.The decrease of the concentration of bonded hydrogen,especially that of(Si-H2)n with increasing substrate temperature(Ts),was observed in FTIR spectra,suggesting the atomic density increases and the concentration of microvoids decrease in a-Si:H films.The increase of both the short range order and the intermediate range order of amorphous network for a-Si:H films were verified by Raman scattering spectra,in which increasing Ts decreasing the band width of TO and the scattering intensity ratio ITA/ITO were obtained.All above results clarify the effect of increasing Ts on the microstructure amelioration for a-Si:H films.The reduction of disordered domains is correlated with the film growing process,where the increased surface diffusion mobility and etching of weak bonds is induced by increasing Ts.Furthermore,analysis of optical absorption indicates that the films with a lower optical band gap and a narrower band edge can be obtained by this FTS technique.

  19. Bismuth thin films obtained by pulsed laser deposition

    Science.gov (United States)

    Flores, Teresa; Arronte, Miguel; Rodriguez, Eugenio; Ponce, Luis; Alonso, J. C.; Garcia, C.; Fernandez, M.; Haro, E.

    1999-07-01

    In the present work Bi thin films were obtained by Pulsed Laser Deposition, using Nd:YAG lasers. The films were characterized by optical microscopy. Raman spectroscopy and X-rays diffraction. It was accomplished the real time spectral emission characterization of the plasma generated during the laser evaporation process. Highly oriented thin films were obtained.

  20. Properties of electrophoretically deposited single wall carbon nanotube films

    Energy Technology Data Exchange (ETDEWEB)

    Lim, Junyoung; Jalali, Maryam; Campbell, Stephen A., E-mail: campb001@umn.edu

    2015-08-31

    This paper describes techniques for rapidly producing a carbon nanotube thin film by electrophoretic deposition at room temperature and determines the film mass density and electrical/mechanical properties of such films. The mechanism of electrophoretic deposition of thin layers is explained with experimental data. Also, film thickness is measured as a function of time, electrical field and suspension concentration. We use Rutherford backscattering spectroscopy to determine the film mass density. Films created in this manner have a resistivity of 2.14 × 10{sup −3} Ω·cm, a mass density that varies with thickness from 0.12 to 0.54 g/cm{sup 3}, and a Young's modulus between 4.72 and 5.67 GPa. The latter was found to be independent of thickness from 77 to 134 nm. We also report on fabricating free-standing films by removing the metal seed layer under the CNT film, and selectively etching a sacrificial layer. This method could be extended to flexible photovoltaic devices or high frequency RF MEMS devices. - Highlights: • We explain the electrophoretic deposition process and mechanism of thin SWCNT film deposition. • Characterization of the SWCNT film properties including density, resistivity, transmittance, and Young's modulus. • The film density and resistivity are found to be a function of the film thickness. • Techniques developed to create free standing layers of SW-CNTs for flexible electronics and mechanical actuators.

  1. Low-cost fabrication of WO{sub 3} films using a room temperature and low-vacuum air-spray based deposition system for inorganic electrochromic device applications

    Energy Technology Data Exchange (ETDEWEB)

    Park, Sung-Ik [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Kim, Sooyeun, E-mail: sooyeunk@u.washington.edu [Department of Mechanical Engineering, University of Washington, Seattle, WA (United States); Choi, Jung-Oh; Song, Ji-Hyeon [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Taya, Minoru [Department of Mechanical Engineering, University of Washington, Seattle, WA (United States); Ahn, Sung-Hoon, E-mail: ahnsh@snu.ac.kr [Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul (Korea, Republic of); Institute of Advanced Machines and Design, Seoul (Korea, Republic of)

    2015-08-31

    We report the deposition of tungsten oxide (WO{sub 3}) thin films on fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO) glass substrates by using a room-temperature deposition system based on low-vacuum air-spray for the fabrication of inorganic electrochromic windows. The structure of the WO{sub 3} films was characterized using X-ray diffraction, and the surface morphology and film thickness were investigated using scanning electron microscopy and atomic force microscopy. The color of the prepared WO{sub 3} films changed from slight yellow to dark blue under applied voltages, demonstrating electrochromism. The WO{sub 3} film coated FTO glass exhibited a large electrochromic contrast of up to 50% at a wavelength of 800 nm. The electrochemical properties of the films were examined using cyclic voltammetry and chronocoulometry. - Highlights: • WO{sub 3} thin films were fabricated using an air-spray based deposition system at room temperature under low-vacuum conditions. • Dry WO{sub 3} particles were directly deposited on FTO and ITO glasses by using a low-cost deposition system. • The FTO glass based WO{sub 3} film showed the optical contrast of 50% at a wavelength of 800 nm.

  2. Influence of deposition time on the properties of chemical bath deposited manganese sulfide thin films

    Directory of Open Access Journals (Sweden)

    Anuar Kassim

    2010-12-01

    Full Text Available Manganese sulfide thin films were chemically deposited from an aqueous solution containing manganese sulfate, sodium thiosulfate and sodium tartrate. The influence of deposition time (2, 3, 6 and 8 days on the properties of thin films was investigated. The structure and surface morphology of the thin films were studied by X-ray diffraction and atomic force microscopy, respectively. In addition, in order to investigate the optical properties of the thin films, the UV-visible spectrophotometry was used. The XRD results indicated that the deposited MnS2 thin films exhibited a polycrystalline cubic structure. The number of MnS2 peaks on the XRD patterns initially increased from three to six peaks and then decreased to five peaks, as the deposition time was increased from 2 to 8 days. From the AFM measurements, the film thickness and surface roughness were found to be dependent on the deposition time.

  3. Plasma-deposited a-C(N) H films

    CERN Document Server

    Franceschini, D E

    2000-01-01

    The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.

  4. Direct and Dry Deposited Single-Walled Carbon Nanotube Films Doped with MoO(x) as Electron-Blocking Transparent Electrodes for Flexible Organic Solar Cells.

    Science.gov (United States)

    Jeon, Il; Cui, Kehang; Chiba, Takaaki; Anisimov, Anton; Nasibulin, Albert G; Kauppinen, Esko I; Maruyama, Shigeo; Matsuo, Yutaka

    2015-07-01

    Organic solar cells have been regarded as a promising electrical energy source. Transparent and conductive carbon nanotube film offers an alternative to commonly used ITO in photovoltaics with superior flexibility. This communication reports carbon nanotube-based indium-free organic solar cells and their flexible application. Direct and dry deposited carbon nanotube film doped with MoO(x) functions as an electron-blocking transparent electrode, and its performance is enhanced further by overcoating with PSS. The single-walled carbon nanotube organic solar cell in this work shows a power conversion efficiency of 6.04%. This value is 83% of the leading ITO-based device performance (7.48%). Flexible application shows 3.91% efficiency and is capable of withstanding a severe cyclic flex test.

  5. Deposition of copper selenide thin films and nanoparticles

    Science.gov (United States)

    Hu, Yunxiang; Afzaal, Mohammad; Malik, Mohammad A.; O'Brien, Paul

    2006-12-01

    A new method is reported for the growth of copper selenide thin films and nanoparticles using copper acetylacetonate and trioctylphosphine selenide. Aerosol-assisted chemical vapor deposition experiments lead to successful deposition of tetragonal Cu 2Se films. In contrast, hexadecylamine capped nanoparticles are composed of cubic Cu 2-xSe. The deposited materials are optically and structurally characterized. The results of this comprehensive study are described and discussed.

  6. Sensitivity of CuS and CuS/ITO EGFETs implemented as pH sensors

    Science.gov (United States)

    Sabah, Fayroz A.; Ahmed, Naser M.; Hassan, Z.; Al-Hardan, Naif H.

    2016-09-01

    Several studies have been performed on the use of ITO as an extended gate of field effect transistor. Studies have also been done on the effects of using ITO as a substrate to improve the sensitivity of SnO2 membrane. In this research, the ITO was used as a substrate for the synthesis of CuS thin films to determine its potential to improve sensitivity and any possible application as pH sensors. The CuS thin film was prepared from copper chloride and sodium thiosulfate via spray pyrolysis deposition using de-ionized water as a solvent. The sensitivity of the CuS/ITO membrane was measured and comparatively analyzed against that of CuS membrane. Structural and morphological properties were investigated for both as-deposit thin films. The membranes were then deployed as pH sensors and their sensitivities measured. The results confirmed that CuS/ITO membrane had much better sensitivity (37 µA/pH and 37 mV/pH) compared to CuS membrane (8 µA/pH and 7.5 mV/pH).

  7. Control and enhancement of the oxygen storage capacity of ceria films by variation of the deposition gas atmosphere during pulsed DC magnetron sputtering

    Science.gov (United States)

    Eltayeb, Asmaa; Vijayaraghavan, Rajani K.; McCoy, Anthony; Venkatanarayanan, Anita; Yaremchenko, Aleksey A.; Surendran, Rajesh; McGlynn, Enda; Daniels, Stephen

    2015-04-01

    In this study, nanostructured ceria (CeO2) films are deposited on Si(100) and ITO coated glass substrates by pulsed DC magnetron sputtering using a CeO2 target. The influence on the films of using various gas ambients, such as a high purity Ar and a gas mixture of high purity Ar and O2, in the sputtering chamber during deposition are studied. The film compositions are studied using XPS and SIMS. These spectra show a phase transition from cubic CeO2 to hexagonal Ce2O3 due to the sputtering process. This is related to the transformation of Ce4+ to Ce3+ and indicates a chemically reduced state of CeO2 due to the formation of oxygen vacancies. TGA and electrochemical cyclic voltammetry (CV) studies show that films deposited in an Ar atmosphere have a higher oxygen storage capacity (OSC) compared to films deposited in the presence of O2. CV results specifically show a linear variation with scan rate of the anodic peak currents for both films and the double layer capacitance values for films deposited in Ar/O2 mixed and Ar atmosphere are (1.6 ± 0.2) × 10-4 F and (4.3 ± 0.5) × 10-4 F, respectively. Also, TGA data shows that Ar sputtered samples have a tendency to greater oxygen losses upon reduction compared to the films sputtered in an Ar/O2 mixed atmosphere.

  8. Pulsed laser deposited indium tin oxides as alternatives to noble metals in the near-infrared region.

    Science.gov (United States)

    Fang, Xu; Mak, C L; Zhang, Shiyu; Wang, Zhewei; Yuan, Wenjia; Ye, Hui

    2016-06-08

    Transparent conductive indium tin oxide thin films with thickness around 200 nm were deposited on glass substrates by pulsed laser deposition technology. The microstructure and the electrical and optical properties of the ITO films deposited under different oxygen pressures and substrate temperatures were systematically investigated. Distinct different x-ray diffraction patterns revealed that the crystallinity of ITO films was highly influenced by deposition conditions. The highest carrier concentration of the ITO films was obtained as 1.34  ×  10(21) cm(-3) with the lowest corresponding resistivity of 2.41  ×  10(-4) Ω cm. Spectroscopic ellipsometry was applied to retrieve the dielectric permittivity of the ITO films to estimate their potential as plasmonic materials in the near-infrared region. The crossover wavelength (the wavelength where the real part of the permittivity changes from positive to negative) of the ITO films exhibited high dependence on the deposition conditions and was optimized to as low as 1270 nm. Compared with noble metals (silver or gold etc), the lower imaginary part of the permittivity (<3) of ITO films suggests the potential application of ITO in the near-infrared range.

  9. Effects of deposition time in chemically deposited ZnS films in acidic solution

    Energy Technology Data Exchange (ETDEWEB)

    Haddad, H.; Chelouche, A., E-mail: azeddinechelouche@gmail.com; Talantikite, D.; Merzouk, H.; Boudjouan, F.; Djouadi, D.

    2015-08-31

    We report an experimental study on the synthesis and characterization of zinc sulfide (ZnS) single layer thin films deposited on glass substrates by chemical bath deposition technique in acidic solution. The effect of deposition time on the microstructure, surface morphology, optical absorption, transmittance, and photoluminescence (PL) was investigated by X-ray diffraction (XRD), scanning electronic microscopy (SEM), UV-Vis–NIR spectrophotometry and photoluminescence (PL) spectroscopy. The results showed that the samples exhibit wurtzite structure and their crystal quality is improved by increasing deposition time. The latter, was found to affect the morphology of the thin films as showed by SEM micrographs. The optical measurements revealed a high transparency in the visible range and a dependence of absorption edge and band gap on deposition time. The room temperature PL spectra indicated that all ZnS grown thin films emit a UV and blue light, while the band intensities are found to be dependent on deposition times. - Highlights: • Single layer ZnS thin films were deposited by CBD in acidic solution at 95 °C. • The effect of deposition time was investigated. • Coexistence of ZnS and ZnO hexagonal structures for time deposition below 2 h • Thicker ZnS films were achieved after monolayer deposition for 5 h. • The highest UV-blue emission observed in thin film deposited at 5 h.

  10. Spatial atomic layer deposition of zinc oxide thin films

    NARCIS (Netherlands)

    Illiberi, A.; Roozeboom, F.; Poodt, P.W.G.

    2012-01-01

    Zinc oxide thin films have been deposited at high growth rates (up to ~1 nm/s) by spatial atomic layer deposition technique at atmospheric pressure. Water has been used as oxidant for diethylzinc (DEZ) at deposition temperatures between 75 and 250 °C. The electrical, structural (crystallinity and mo

  11. SnS thin films deposited by chemical bath deposition, dip coating and SILAR techniques

    Science.gov (United States)

    Chaki, Sunil H.; Chaudhary, Mahesh D.; Deshpande, M. P.

    2016-05-01

    The SnS thin films were synthesized by chemical bath deposition (CBD), dip coating and successive ionic layer adsorption and reaction (SILAR) techniques. In them, the CBD thin films were deposited at two temperatures: ambient and 70 °C. The energy dispersive analysis of X-rays (EDAX), X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM) and optical spectroscopy techniques were used to characterize the thin films. The electrical transport properties studies on the as-deposited thin films were done by measuring the I-V characteristics, DC electrical resistivity variation with temperature and the room temperature Hall effect. The obtained results are deliberated in this paper.

  12. Crystalline Indium Sulphide thin film by photo accelerated deposition technique

    Science.gov (United States)

    Dhanya, A. C.; Preetha, K. C.; Deepa, K.; Remadevi, T. L.

    2015-02-01

    Indium sulfide thin films deserve special attention because of its potential application as buffer layers in CIGS based solar cells. Highly transparent indium sulfide (InS) thin films were prepared using a novel method called photo accelerated chemical deposition (PCD). Ultraviolet source of 150 W was used to irradiate the solution. Compared to all other chemical methods, PCD scores its advantage for its low cost, flexible substrate and capable of large area of deposition. Reports on deposition of high quality InS thin films at room temperature are very rare in literature. The precursor solution was initially heated to 90°C for ten minutes and then deposition was carried out at room temperature for two hours. The appearance of the film changed from lemon yellow to bright yellow as the deposition time increased. The sample was characterized for its structural and optical properties. XRD profile showed the polycrystalline behavior of the film with mixed phases having crystallite size of 17 nm. The surface morphology of the films exhibited uniformly distributed honey comb like structures. The film appeared to be smooth and the value of extinction coefficient was negligible. Optical measurements showed that the film has more than 80% transmission in the visible region. The direct band gap energy was 2.47eV. This method is highly suitable for the synthesis of crystalline and transparent indium sulfide thin films and can be used for various photo voltaic applications.

  13. Nanocrystalline Diamond Films Deposited by Electron Assisted Hot Filament Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    Nanocrystalline diamond films were deposited on polished Si wafer surface with electron assisted hot filament chemical vapor deposition at 1 kPa gas pressure, the deposited films were characterized and observed by Raman spectrum, X-ray diffraction, atomic force microscopy and semiconductor characterization system. The results show that when 8 A bias current is applied for 5 h, the surface roughness decreases to 28.5 nm. After 6 and 8 A bias current are applied for 1 h, and the nanocrystalline films deposition continue for 4 h with 0 A bias current at 1 kPa gas pressure. The nanocrystalline diamond films with 0.5×109 and 1×1010 Ω·cm resistivity respectively are obtained. It is demonstrated that electron bombardment plays an important role of nucleation to deposit diamond films with smooth surface and high resistivity.

  14. Sputtering deposition and characterization of ultrathin amorphous carbon films

    Science.gov (United States)

    Lu, Wei

    1999-11-01

    This dissertation focuses on experimental investigations of ultrathin, ultrasmooth amorphous carbon (a-C) films deposited on Si(100) substrates by radio frequency (RF) sputtering and characterization of the nanomechanical and nanotribological properties and thermal stability of the films. Ultrathin a-C films of thickness 5--100 nm and typical root-mean-square roughness of 0.15--1 nm were deposited on ultrasmooth Si(100) substrates using pure argon as the sputtering gas. A low-pressure RF argon discharge model was used to analyze the plasma parameters in the film growth environment. These plasma parameters correlate the deposition conditions with the film growth processes. Atomic force microscopy (AFM) and surface force microscopy (SFM) were used to characterize the nanomechanical and nanotribological properties of the a-C films. X-ray photoelectron spectroscopy (XPS) was used to investigate the compositions and microstructures of the films. Sputter-etching measurements of the a-C films by energetic argon ion bombardment were used to study the surface binding energy of carbon atoms in a-C films deposited under different conditions. The dependence of film properties on deposition conditions was studied, and relations between nanomechanical and nanotribological properties were discussed in terms of a modified deformation index. The deformation and nanotribology mechanisms of the a-C films were compared with those of other films, such as TiC and Cr films (both 100 nm thick), and bulk Si(100). Reactive RF sputtering of nitrogenated amorphous carbon (a-CNx) films was investigated by introducing nitrogen into the a-C films during film growth by using an argon-nitrogen gas mixture as the sputtering gas. The alloying effect of nitrogen on the film growth and properties, such as hardness and surface energy, was studied and interpreted in terms of the changes in the plasma environment induced due to differences in the composition of the sputtering gas mixture. The thermal

  15. Iridium thin films deposited via pulsed laser deposition for future applications as transition-edge sensors

    Energy Technology Data Exchange (ETDEWEB)

    Galeazzi, M. E-mail: galeazzi@physics.miami.edu; Chen, C.; Cohn, J.L.; Gundersen, J.O

    2004-03-11

    The University of Miami has recently started developing and studying high-resolution microcalorimeters operating near 100 mK for X-ray and particle physics and astrophysics. These detectors will be based on Transition Edge Sensors technology fabricated using iridium thin films deposited via the Pulsed Laser Deposition technique. We report here the preliminary result of the room temperature characterization of the Ir thin films, and an overview of future plans to use the films as transition edge sensors.

  16. Vacuum-integrated electrospray deposition for highly reliable polymer thin film.

    Science.gov (United States)

    Park, Soohyung; Lee, Younjoo; Yi, Yeonjin

    2012-10-01

    Vacuum electrospray deposition (ESD) equipment was designed to prepare polymer thin films. The polymer solution can be injected directly into vacuum system through multi-stage pumping line, so that the solvent residues and ambient contaminants are highly reduced. To test the performance of ESD system, we fabricated organic photovoltaic cells (OPVCs) by injecting polymer solution directly onto the substrate inside a high vacuum chamber. The OPVC fabricated has the structure of Al∕P3HT:PCBM∕PEDOT:PSS∕ITO and was optimized by varying the speed of solution injection and concentration of the solution. The power conversion efficiency (PCE) of the optimized OPVC is 3.14% under AM 1.5G irradiation without any buffer layer at the cathode side. To test the advantages of the vacuum ESD, we exposed the device to atmosphere between the deposition steps of the active layer and cathode. This showed that the PCE of the vacuum processed device is 24% higher than that of the air exposed device and confirms the advantages of the vacuum prepared polymer film for high performance devices.

  17. Electrical Field Effects in Phthalocyanine Film Growth by Vapor Deposition

    Science.gov (United States)

    Banks, Curtis E.; Zhu, Shen; Frazier, Donald O.; Penn, Benjamin; Abdeldayem, Hossin; Hicks, Roslin; Sarkisov, Sergey

    1999-01-01

    Phthalocyanine, an organic material, is a very good candidate for non-linear optical application, such as high-speed switching and optical storage devices. Phthalocyanine films have been synthesized by vapor deposition on quartz substrates. Some substrates were coated with a very thin gold film for introducing electrical field. These films have been characterized by surface morphology, material structure, chemical and thermal stability, non-linear optical parameters, and electrical behaviors. The films have excellent chemical and optical stability. However, the surface of these films grown without electrical field shows flower-like morphology. When films are deposited under an electrical field ( an aligned structure is revealed on the surface. A comparison of the optical and electrical properties and the growth mechanism for these films grown with and without an electrical field will be discussed.

  18. Characterization and Electrical Properties of TiO2 Thin Films Deposited by Pulsed Laser Deposition

    Science.gov (United States)

    Badar, Nurhanna; Kamarulzaman, Norlida

    2011-12-01

    Thin film technology is very important in today's high-tech industry. TiO2 is a high-k dielectric material. Problems with thin film deposition arise when the thickness of the thin layers approaches a few hundred nm to less than 100 nm. High quality thin films within these dimensions are difficult to obtain. Issues of adhesion, crystal mismatch, crystal orientation, surface roughness, densification, etc. are problems that need to be addressed if good quality thin films for devices are to be fabricated. These factors have a relation with the thin film technique used. As an example, spin coating technique may be a cheaper technique but may not result in dense and very smooth surfaces. Pulsed LASER deposition (PLD) is a relatively newer method used in thin film fabrication. The advantages of PLD are, capability of very thin films being deposited on different types of substrates (up to monolayers), control of crystal orientation, capability of depositing materials with complex stoichiometry and ease of methodology with high throughput. This has industrial implications as a good method for thin film preparation. This work involves the deposition of TiO2 thin films using different deposition parameters and chamber environments.

  19. A comparison of ZnO films deposited on indium tin oxide and soda lime glass under identical conditions

    Energy Technology Data Exchange (ETDEWEB)

    Deka, Angshuman; Nanda, Karuna Kar [Materials Research Centre, Indian Institute of Science, Bangalore - 560012 (India)

    2013-06-15

    ZnO films have been grown via a vapour phase transport (VPT) on soda lime glass (SLG) and indium-tin oxide (ITO) coated glass. ZnO film on ITO had traces of Zn and C which gives them a dark appearance while that appears yellowish-white on SLG. X-ray photoelectron spectroscopy studies confirm the traces of C in the form of C-O. The photoluminescence studies reveal a prominent green luminescence band for ZnO film on ITO.

  20. Nanostructuring thin Au films on transparent conductive oxide substrates

    Energy Technology Data Exchange (ETDEWEB)

    Ruffino, F., E-mail: francesco.ruffino@ct.infn.it [Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania (Italy); Center for Materials and Technologies for Information Communication and Solar Energy (MATIS CNR-IMM), via S. Sofia 64, 95123 Catania (Italy); Crupi, I. [Center for Materials and Technologies for Information Communication and Solar Energy (MATIS CNR-IMM), via S. Sofia 64, 95123 Catania (Italy); Carria, E. [Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania (Italy); Center for Materials and Technologies for Information Communication and Solar Energy (MATIS CNR-IMM), via S. Sofia 64, 95123 Catania (Italy); Kimiagar, S. [Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania (Italy); Islamic Azad University, Central Tehran Branch, Forsat Shirazi St. North Eskanari St. Azadi Rd. No 136, 13185/768 Tehran (Iran, Islamic Republic of); Simone, F.; Grimaldi, M.G. [Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania (Italy); Center for Materials and Technologies for Information Communication and Solar Energy (MATIS CNR-IMM), via S. Sofia 64, 95123 Catania (Italy)

    2013-05-15

    Highlights: ► Thermal-induced morphology evolution of Au nanoclusters on ITO is studied. ► Laser irradiation-induced morphology evolution of thin Au film on ITO is studied. ► Au nanorings formation on ITO is presented. ► Au nanoclusters formation on ITO is presented. -- Abstract: Fabrication processes of Au nanostructures on indium-tin-oxide (ITO) surface by simple, versatile, and low-cost bottom-up methodologies are investigated in this work. A first methodology exploits the patterning effects induced by nanosecond laser irradiations on thin Au films deposited on ITO surface. We show that after the laser irradiations, the Au film break-up into nanoclusters whose mean size and surface density are tunable by the laser fluence. A second methodology exploits, instead, the patterning effects of standard furnace thermal processes on the Au film deposited on the ITO. We observe, in this case, a peculiar shape evolution from pre-formed nanoclusters during the Au deposition stage on the ITO, to holed nanostructures (i.e. nanorings), during the furnace annealing processes. The nanorings depth, height, width, and surface density are shown to be tunable by annealing temperature and time.

  1. Derivation of the complex refractive index of ITO and ITON films in the infrared region of the spectrum by the analysis of optical measurements

    Energy Technology Data Exchange (ETDEWEB)

    Kondilis, A. [Microelectronics Research Group, Institute of Electronic Structure and Laser, Foundation for Research and Technology-FORTH-Hellas, P. O. Box 1527, Heraklion 71110, Crete (Greece); Department of Materials Science and Technology, University of Crete, P. O. Box 2208, Heraklion 71003, Crete (Greece)], E-mail: kondilis@physics.uoc.gr; Aperathitis, E. [Microelectronics Research Group, Institute of Electronic Structure and Laser, Foundation for Research and Technology-FORTH-Hellas, P. O. Box 1527, Heraklion 71110, Crete (Greece); Modreanu, M. [Photonics Group, Tyndall National Institute, Lee Maltings, Prospect Row, Cork (Ireland)

    2008-09-30

    We use the Newton-Raphson method to analyze the optical spectra of indium-tin-oxide and indium-tin-oxynitride films, by deriving the complex refractive index and, thereby, the plasma wavelength and the relaxation time. Reflectance and transmittance as well as partial derivatives of them, necessary for the application of the method, are introduced in analytical form reducing complexity and improving speed. The films we have investigated were deposited on glass by sputtering at different RF power levels. After deposition, they were subjected to annealing at 600 deg. C and were measured prior to and after that treatment. The results obtained are physically meaningful and lead to useful inferences about the quality of the material in the two different types of the investigated films.

  2. Nanoparticles Modified ITO Based Biosensor

    Science.gov (United States)

    Khan, M. Z. H.

    2017-04-01

    Incorporation of nanomaterials with controlled molecular architecture shows great promise in improving electronic communication between biomolecules and the electrode substrate. In electrochemical applications metal nanoparticles (NPs) modified electrodes have been widely used and are emerging as candidates to develop highly sensitive electrochemical sensors. There has been a growing technological interest in modified indium tin oxide (ITO) electrodes due to their prominent optoelectronic properties and their wide use as a transducing platform. The introduction of NPs into the transducing platform is commonly achieved by their adsorption onto conventional electrode surfaces in various forms, including that of a composite. The aim of this review is to discuss the role of metallic NPs for surface fabrication of ITO thin films leading to detection of specific biomolecules and applications as a biosensor platform.

  3. Nanoparticles Modified ITO Based Biosensor

    Science.gov (United States)

    Khan, M. Z. H.

    2016-12-01

    Incorporation of nanomaterials with controlled molecular architecture shows great promise in improving electronic communication between biomolecules and the electrode substrate. In electrochemical applications metal nanoparticles (NPs) modified electrodes have been widely used and are emerging as candidates to develop highly sensitive electrochemical sensors. There has been a growing technological interest in modified indium tin oxide (ITO) electrodes due to their prominent optoelectronic properties and their wide use as a transducing platform. The introduction of NPs into the transducing platform is commonly achieved by their adsorption onto conventional electrode surfaces in various forms, including that of a composite. The aim of this review is to discuss the role of metallic NPs for surface fabrication of ITO thin films leading to detection of specific biomolecules and applications as a biosensor platform.

  4. Generación de estados superficiales durante la formación electroforética catódica de películas de TiO2 sobre ito

    Directory of Open Access Journals (Sweden)

    Próspero Acevedo-Peña

    2011-01-01

    Full Text Available In the present work TiO2 films were formed over Indium Tin Oxide (ITO employing cathodic electrophoretic deposition (Cathodic-EPD and Dr. Blade Technique. The films were characterized by electrochemical techniques in order to compare their electronic properties; as well as, their photoelectrochemical behavior. The electrochemical performance showed by the films, allowed to relate the modification occurring during the Cathodic-EPD, with the partial reduction of TiO2 nanoparticles, generating Ti3+ defects. These trapping states are modifying the electronic properties of the film, and diminishing the transport of the photoelectrogenerated electrons toward ITO.

  5. Chemical solution deposition of functional oxide thin films

    CERN Document Server

    Schneller, Theodor; Kosec, Marija

    2014-01-01

    Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.

  6. Dual Ion Beam Deposition Of Diamond Films On Optical Elements

    Science.gov (United States)

    Deutchman, Arnold H.; Partyka, Robert J.; Lewis, J. C.

    1990-01-01

    Diamond film deposition processes are of great interest because of their potential use for the formation of both protective as well as anti-reflective coatings on the surfaces of optical elements. Conventional plasma-assisted chemical vapor deposition diamond coating processes are not ideal for use on optical components because of the high processing temperatures required, and difficulties faced in nucleating films on most optical substrate materials. A unique dual ion beam deposition technique has been developed which now makes possible deposition of diamond films on a wide variety of optical elements. The new DIOND process operates at temperatures below 150 aegrees Farenheit, and has been used to nucleate and grow both diamondlike carbon and diamond films on a wide variety of optical :taterials including borosilicate glass, quartz glass, plastic, ZnS, ZnSe, Si, and Ge.

  7. Chemical bath ZnSe thin films: deposition and characterisation

    Science.gov (United States)

    Lokhande, C. D.; Patil, P. S.; Ennaoui, A.; Tributsch, H.

    1998-01-01

    The zinc selenide (ZnSe) thin films have been deposited by a simple and inexpensive chemical bath deposition (CBD) method. The selenourea was used as a selenide ion source. The ZnSe films have been characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDAX), Rutherford back scattering (RBS), and optical absorption. The as-deposited ZnSe films on various substrates are found to be amorphous and contain O2 and N2 in addition to Zn and Se. The optical band gap of the film is estimated to be 2.9 eV. The films are photoactive as evidenced by time resolved microwave conductivity (TRMC).

  8. Spin-coating deposition of PbS and CdS thin films for solar cell application

    Energy Technology Data Exchange (ETDEWEB)

    Patel, Jayesh; Mighri, Frej [Laval University, CREPEC, Department of Chemical Engineering, Quebec, QC (Canada); Ajji, Abdellah [Ecole Polytechnique, CREPEC, Chemical Engineering Department, Montreal, QC (Canada); Tiwari, Devendra; Chaudhuri, Tapas K. [Charotar University of Science and Technology (CHARUSAT), Dr. K.C. Patel Research and Development Centre, Anand District, Gujarat (India)

    2014-12-15

    In this work, we describe a simple spin-coating deposition technique for lead sulphide (PbS) and cadmium sulphide (CdS) films from a methanolic metal-thiourea complex. The characterization of the films by X-ray diffraction and X-ray photoelectron spectroscopy techniques revealed that pure cubic phase PbS and CdS layers were formed via this method. As shown by atomic force microscopy and scanning electron microscopy results, both films were homogeneous and presented a smooth surface. Optical properties showed that the energy band gap of PbS and CdS films were around 1.65 and 2.5 eV, respectively. The PbS film is p-type in nature with an electrical conductivity of around 0.8 S/cm. The hole concentration and mobility were 2.35 x 10{sup 18} cm{sup -3} and 2.16 x 10{sup -3} cm{sup 2}/V/s, respectively, as determined from Hall measurement. Both films were used to develop a thin film solar cell device of graphite/PbS/CdS/ITO/glass. Device characterization showed the power conversion efficiency of around 0.24 %. The corresponding open circuit voltage, short circuit current and fill factor were 0.570 V, 1.32 mA/cm{sup 2} and 0.32, respectively. (orig.)

  9. Nitrogen incorporation in sputter deposited molybdenum nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Stöber, Laura, E-mail: laura.stoeber@tuwien.ac.at; Patocka, Florian, E-mail: florian.patocka@tuwien.ac.at; Schneider, Michael, E-mail: michael.schneider@tuwien.ac.at; Schmid, Ulrich, E-mail: ulrich.e366.schmid@tuwien.ac.at [Institute of Sensor and Actuator Systems, TU Wien, Gußhausstraße 27-29, A-1040 Vienna (Austria); Konrath, Jens Peter, E-mail: jenspeter.konrath@infineon.com; Haberl, Verena, E-mail: verena.haberl@infineon.com [Infineon Technologies Austria AG, Siemensstraße 2, 9500 Villach (Austria)

    2016-03-15

    In this paper, the authors report on the high temperature performance of sputter deposited molybdenum (Mo) and molybdenum nitride (Mo{sub 2}N) thin films. Various argon and nitrogen gas compositions are applied for thin film synthetization, and the amount of nitrogen incorporation is determined by Auger measurements. Furthermore, effusion measurements identifying the binding conditions of the nitrogen in the thin film are performed up to 1000 °C. These results are in excellent agreement with film stress and scanning electron microscope analyses, both indicating stable film properties up to annealing temperatures of 500 °C.

  10. Continuous wave infrared laser deposition of organic thin films

    Energy Technology Data Exchange (ETDEWEB)

    Yaginuma, Seiichiro [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Yamaguchi, Jun [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Haemori, Masamitsu [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Itaka, Kenji [Department of Advanced Materials Science, Graduate School of Frontier Sciences, Univesity of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8568 (Japan); Matsumoto, Yuji [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Kondo, Michio [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Koinuma, Hideomi [Department of Advanced Materials Science, Graduate School of Frontier Sciences, Univesity of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8568 (Japan)

    2007-04-15

    We developed a continuous-wave infrared laser molecular beam epitaxy (CW-IR-LMBE) optimized for the fabrication of organic semiconductor films. The crystal quality of these organic thin films deposited by CW-IR-LMBE was substantially the same as those deposited by thermal evaporation. Due to the possibility of quick switching of evaporation sources, CW-IR-LMBE is especially advantageous for rapid screening of composition, thickness, and fabrication parameters in materials and device optimization based on combinatorial technology.

  11. Comparison study of transparent RF-sputtered ITO/AZO and ITO/ZnO bilayers for near UV-OLED applications

    Science.gov (United States)

    Rezaie, Mahdiyar Nouri; Manavizadeh, Negin; Abadi, Ehsan Mohammadi Nasr; Nadimi, Ebrahim; Boroumand, Farhad Akbari

    2017-01-01

    Hybrid inorganic/organic light-emitting diodes have attracted much attention in the field of luminescent electronics due to the desired incorporation of high optoelectronic features of inorganic materials with the processability and variety of organic polymers. To generate and emit a near ultraviolet (N-UV) ray, wide band gap semiconductors can be applied in the organic light-emitting diodes (OLEDs). In this paper, zinc oxide (ZnO) and aluminum-doped ZnO (AZO) thin films are deposited by radio frequency (RF) sputtering above the ITO electrode and poly [2-methoxy-5-(2-ethyl-hexyloxy)-1,4-phenylene-vinylene] (MEH-PPV) conjugated polymer is utilized as a complementary p-type semiconductor in OLED structure. The impact of ZnO and AZO thickness on the structural, electrical, optical and morphological properties of ITO/AZO and ITO/ZnO bilayers are scrutinized and compared. Results show that with the enlargement of both ZnO and AZO film thickness, the physical properties are gradually improved resulting in the better quality of transparent conducting thin film. The average electrical resistivity of 8.4 × 10-4 and 1.1 × 10-3 Ω-cm, average sheet resistance of 32.9 and 42.3 Ω/sq, average transmittance of 88.3 and 87.3% and average FOM of 1.0 × 104 and 7.4 × 103 (Ω-cm)-1 are obtained for ITO/AZO and ITO/ZnO bilayers, respectively. Moreover, comparing the results indicates that the strain and the stress within the ITO/AZO bilayer are decreased nearly 19% with respect to ITO/ZnO bilayer which yield higher quality of crystal. Consequently, the physical properties of ITO/AZO bilayer is found to be superior regarding ITO/ZnO bilayer. For fabricated UV-OLEDs, the turn-on voltages, the characteristic energy (Et) and the total concentration of traps (Nt) for the devices with the structures of ITO/ZnO/MEH-PPV/Al and ITO/AZO/MEH-PPV/Al are obtained 12 and 14 V, 0.108 and 0.191 eV, 9.33 × 1016 and 5.22 × 1016 cm-3, respectively. Furthermore, according to the electroluminescence

  12. ZnS thin film deposited with chemical bath deposition process directed by different stirring speeds

    Science.gov (United States)

    Zhang, Y.; Dang, X. Y.; Jin, J.; Yu, T.; Li, B. Z.; He, Q.; Li, F. Y.; Sun, Y.

    2010-09-01

    In this combined film thickness, scanning electron microscopy (SEM), X-ray diffraction and optical properties study, we explore the effects of different stirring speeds on the growth and optical properties of ZnS film deposited by CBD method. From the disclosed changes of thickness of ZnS film, we conclude that film thickness is independent of the stirring speeds in the heterogeneous process (deposition time less than 40 min), but increases with the stirring speeds and/or deposition time increasing in the homogeneous process. Grazing incident X-ray diffraction (GIXRD) and the study of optical properties disclosed that the ZnS films grown with different stirring speeds show partially crystallized film and exhibit good transmittance (70-88% in the visible region), but the stirring speeds cannot give much effects on the structure and optical properties in the homogeneous process.

  13. Hardness and stress of amorphous carbon film deposited by glow discharge and ion beam assisting deposition

    CERN Document Server

    Marques, F C

    2000-01-01

    The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp sup 2 -rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp sup 3 sites. Furthermore, the same results also indicate that the sp sup 2 sites may also contribute to the hardness of the films.

  14. Radio Frequency Magnetron Sputtering Deposition of TiO2 Thin Films and Their Perovskite Solar Cell Applications

    Science.gov (United States)

    Chen, Cong; Cheng, Yu; Dai, Qilin; Song, Hongwei

    2015-12-01

    In this work, we report a physical deposition based, compact (cp) layer synthesis for planar heterojunction perovskite solar cells. Typical solution-based synthesis of cp layer for perovskite solar cells involves low-quality of thin films, high-temperature annealing, non-flexible devices, limitation of large-scale production and that the effects of the cp layer on carrier transport have not been fully understood. In this research, using radio frequency magnetron sputtering (RFMS), TiO2 cp layers were fabricated and the thickness could be controlled by deposition time; CH3NH3PbI3 films were prepared by evaporation & immersion (E & I) method, in which PbI2 films made by thermal evaporation technique were immersed in CH3NH3I solution. The devices exhibit power conversion efficiency (PCE) of 12.1% and the photovoltaic performance can maintain 77% of its initial PCE after 1440 h. The method developed in this study has the capability of fabricating large active area devices (40 × 40 mm2) showing a promising PCE of 4.8%. Low temperature and flexible devices were realized and a PCE of 8.9% was obtained on the PET/ITO substrates. These approaches could be used in thin film based solar cells which require high-quality films leading to reduced fabrication cost and improved device performance.

  15. Radio Frequency Magnetron Sputtering Deposition of TiO2 Thin Films and Their Perovskite Solar Cell Applications.

    Science.gov (United States)

    Chen, Cong; Cheng, Yu; Dai, Qilin; Song, Hongwei

    2015-12-03

    In this work, we report a physical deposition based, compact (cp) layer synthesis for planar heterojunction perovskite solar cells. Typical solution-based synthesis of cp layer for perovskite solar cells involves low-quality of thin films, high-temperature annealing, non-flexible devices, limitation of large-scale production and that the effects of the cp layer on carrier transport have not been fully understood. In this research, using radio frequency magnetron sputtering (RFMS), TiO2 cp layers were fabricated and the thickness could be controlled by deposition time; CH3NH3PbI3 films were prepared by evaporation &immersion (E &I) method, in which PbI2 films made by thermal evaporation technique were immersed in CH3NH3I solution. The devices exhibit power conversion efficiency (PCE) of 12.1% and the photovoltaic performance can maintain 77% of its initial PCE after 1440 h. The method developed in this study has the capability of fabricating large active area devices (40 × 40 mm(2)) showing a promising PCE of 4.8%. Low temperature and flexible devices were realized and a PCE of 8.9% was obtained on the PET/ITO substrates. These approaches could be used in thin film based solar cells which require high-quality films leading to reduced fabrication cost and improved device performance.

  16. Radio Frequency Magnetron Sputtering Deposition of TiO2 Thin Films and Their Perovskite Solar Cell Applications

    Science.gov (United States)

    Chen, Cong; Cheng, Yu; Dai, Qilin; Song, Hongwei

    2015-01-01

    In this work, we report a physical deposition based, compact (cp) layer synthesis for planar heterojunction perovskite solar cells. Typical solution-based synthesis of cp layer for perovskite solar cells involves low-quality of thin films, high-temperature annealing, non-flexible devices, limitation of large-scale production and that the effects of the cp layer on carrier transport have not been fully understood. In this research, using radio frequency magnetron sputtering (RFMS), TiO2 cp layers were fabricated and the thickness could be controlled by deposition time; CH3NH3PbI3 films were prepared by evaporation & immersion (E & I) method, in which PbI2 films made by thermal evaporation technique were immersed in CH3NH3I solution. The devices exhibit power conversion efficiency (PCE) of 12.1% and the photovoltaic performance can maintain 77% of its initial PCE after 1440 h. The method developed in this study has the capability of fabricating large active area devices (40 × 40 mm2) showing a promising PCE of 4.8%. Low temperature and flexible devices were realized and a PCE of 8.9% was obtained on the PET/ITO substrates. These approaches could be used in thin film based solar cells which require high-quality films leading to reduced fabrication cost and improved device performance. PMID:26631493

  17. Thin film zinc oxide deposited by CVD and PVD

    Science.gov (United States)

    Hamelmann, Frank U.

    2016-10-01

    Zinc oxide is known as a mineral since 1810, but it came to scientific interest after its optoelectronic properties found to be tuneable by p-type doping. Since the late 1980’s the number of publications increased exponentially. All thin film deposition technologies, including sol-gel and spray pyrolysis, are able to produce ZnO films. However, for outstanding properties and specific doping, only chemical vapor deposition and physical vapor deposition have shown so far satisfying results in terms of high conductivity and high transparency. In this paper the different possibilities for doping will be discussed, some important applications of doped ZnO thin films will be presented. The deposition technologies used for industrial applications are shown in this paper. Especially sputtering of aluminium doped Zinc Oxide (ZnO:Al or AZO) and LPCVD of boron doped Zinc Oxide (ZnO:B or BZO) are used for the commercial production of transparent conductive oxide films on glass used for thin film photovoltaic cells. For this special application the typical process development for large area deposition is presented, with the important trade-off between optical properties (transparency and ability for light scattering) and electrical properties (conductivity). Also, the long term stability of doped ZnO films is important for applications, humidity in the ambient is often the reason for degradation of the films. The differences between the mentioned materials are presented.

  18. Contamination control in ion beam sputter-deposited films

    Science.gov (United States)

    Pearson, David I. C.; Pochon, Sebastien; Cooke, Mike

    2013-09-01

    The conventional wisdom to guarantee high purity thin films in IBSD has been to use a large vacuum chamber usually in excess of 1 m3. The chamber size was important to minimise the effect of reflected high energy particles from the target surface sputtering chamber materials onto the substrate and to allow the use of large targets to avoid beam overspill onto chamber furniture. An improved understanding of beam trajectories and re-sputtered material paths has allowed the deposition of thin films with very low metallic impurity content in a chamber volume below 0.5 m3. Thus, by optimizing the sputter ion source, target and substrate configuration, and by arranging suitable shielding made of an appropriate material in the process chamber, the levels of contaminants in the deposited films have been reduced to a minimum. With this optimum hardware arrangement, the ion beam process parameters were then optimized with respect to the ppm levels of contaminants measured in the films by SIMS analysis. Using the deposition of SiO2 as a standard material for DSIMS composition analysis and impurity level determination, it has been shown that our IBS deposition tool is capable of depositing films with contamination levels of <50ppm for the total of all metal impurities in the deposited films.

  19. Characterization of polymer thin films obtained by pulsed laser deposition

    Science.gov (United States)

    Palla-Papavlu, A.; Dinca, V.; Ion, V.; Moldovan, A.; Mitu, B.; Luculescu, C.; Dinescu, M.

    2011-04-01

    The development of laser techniques for the deposition of polymer and biomaterial thin films on solid surfaces in a controlled manner has attracted great attention during the last few years. Here we report the deposition of thin polymer films, namely Polyepichlorhydrin by pulsed laser deposition. Polyepichlorhydrin polymer was deposited on flat substrate (i.e. silicon) using an NdYAG laser (266 nm, 5 ns pulse duration and 10 Hz repetition rate). The obtained thin films have been characterized by atomic force microscopy, scanning electron microscopy, Fourier transform infrared spectroscopy and spectroscopic ellipsometry. It was found that for laser fluences up to 1.5 J/cm 2 the chemical structure of the deposited polyepichlorhydrin polymer thin layers resembles to the native polymer, whilst by increasing the laser fluence above 1.5 J/cm 2 the polyepichlorohydrin films present deviations from the bulk polymer. Morphological investigations (atomic force microscopy and scanning electron microscopy) reveal continuous polyepichlorhydrin thin films for a relatively narrow range of fluences (1-1.5 J/cm 2). The wavelength dependence of the refractive index and extinction coefficient was determined by ellipsometry studies which lead to new insights about the material. The obtained results indicate that pulsed laser deposition method is potentially useful for the fabrication of polymer thin films to be used in applications including electronics, microsensor or bioengineering industries.

  20. Stress development during deposition of CNx thin films

    Science.gov (United States)

    Broitman, E.; Zheng, W. T.; Sjöström, H.; Ivanov, I.; Greene, J. E.; Sundgren, J.-E.

    1998-05-01

    We have investigated the influence of deposition parameters on stress generation in CNx (0.3films deposited onto Si(001) substrates by reactive magnetron sputtering of C in pure N2 discharges. Film stress, σ, which in all cases is compressive, decreases with an increase in the N2 pressure, PN2, due to structural changes induced by the pressure-dependent variation in the average energy of particles bombarding the film during deposition. The film stress σ is also a function of the film growth temperature, Ts, and exhibits a maximum value of ˜5 GPa at 350 °C. Under these conditions, the films have a distorted microstructure consisting of a three-dimensional, primarily sp2 bonded, network. In contrast, films deposited at Ts<200 °C with a low stress are amorphous. At 350 °Cfilms grown at 350 °C exhibit the highest hardness and elasticity.

  1. Pulsed laser deposition and characterisation of thin superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Morone, A. [CNR, zona industriale di Tito Scalo, Potenza (Italy). Istituto per i Materiali Speciali

    1996-09-01

    Same concepts on pulsed laser deposition of thin films will be discussed and same examples of high transition temperature (HTc) BiSrCaCuO (BISCO) and low transition temperature NbN/MgO/NbN multilayers will be presented. X-ray and others characterizations of these films will be reported and discussed. Electrical properties of superconducting thin films will be realized as a function of structural and morphological aspect.

  2. Influence of cryogenic temperatures on electrical properties of structures patterned by a laser in ITO/Ag/ITO layers

    Energy Technology Data Exchange (ETDEWEB)

    Lebioda, Marcin; Pawlak, Ryszard [Institute of Electrical Engineering Systems, Lodz University of Technology (Poland)

    2016-05-15

    The electrical properties of highly conductive ITO/Ag/ITO multilayer film at cryogenic temperatures have been presented in the paper for the first time. A good electrical conductivity and high thermal resistance of ITO/Ag/ITO are desirable features at cryogenic temperatures. Elements in ITO/Ag/ITO (AgHT trademark) were patterned using fiber laser ablation. Close to a linear (R{sup 2} = 0.999) relationship between resistance and temperature in the range of 293-55 K was confirmed. The dynamics of resistance changes is of the order of 9 x 10{sup -4} 1/K. Carrier concentration and mobility have been determined on the basis of Hall voltage measurements. Structures patterned in AgHT trademark conductive film can be seen to be suitable for passive elements of low-temperature electronics. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  3. Luminescent thin films by the chemical aerosol deposition technology (CADT)

    NARCIS (Netherlands)

    Martin, F.J.; Martin, F.J.; Albers, H.; Lambeck, Paul; Popma, T.J.A.; van de Velde, G.M.H.

    1992-01-01

    Zinc sulphide thin films have been deposited with CART using zinc chlorideand zinc acetylacetonate as Zn compounds and thiourea and 1,1,3,3-tetramethylthiourea as S compounds soluted in methanol, ethanol, isopropanol and cellosolve. After optimalization of the deposition process homogeneous layers

  4. Ubiquitous pentacene monolayer on metals deposited onto pentacene films.

    Science.gov (United States)

    Jaeckel, B; Sambur, J B; Parkinson, B A

    2007-11-01

    Photoelectron spectroscopy (XPS and UPS) was used to study the deposition of metal layers (Ag, Cu, and Au) onto pentacene films. Very low work functions were measured (PhiAg = 3.91 eV, PhiCu = 3.93 eV, and PhiAu = 4.3 eV) for all of the metals, in agreement with results from the literature. The intensities of the C 1s core-level signals from pentacene that were monitored during stepwise metal deposition leveled off at a value of about 30% of a thick pentacene film. This C 1s intensity is comparable to that of one monolayer of pentacene deposited onto the respective metal. The valence band spectra of metals deposited onto pentacene and spectra collected for pentacene deposited onto bare metal surfaces are very similar. These findings lead to the conclusion that approximately one monolayer of pentacene is always present on top of the freshly deposited metal film, which explains the very low work function of the metals when they are deposited onto organic films. We expect similar behavior with other nonreactive metals deposited onto stable organic layers.

  5. Stoichiometry controlled oxide thin film growth by pulsed laser deposition

    NARCIS (Netherlands)

    Groenen, Rik; Smit, Jasper; Orsel, Kasper; Vailionis, Arturas; Bastiaens, Bert; Huijben, Mark; Boller, Klaus; Rijnders, Guus; Koster, Gertjan

    2015-01-01

    The oxidation of species in the plasma plume during pulsed laser deposition controls both the stoichiometry as well as the growth kinetics of the deposited SrTiO3 thin films, instead of the commonly assumed mass distribution in the plasma plume and the kinetic energy of the arriving species. It was

  6. Vacuum deposition of stoichiometric crystalline PbS films: The effect of sulfurizing environment during deposition

    Science.gov (United States)

    Singh, B. P.; Kumar, R.; Kumar, A.; Tyagi, R. C.

    2015-10-01

    Thin film of lead sulfide (PbS) was deposited onto highly cleaned glass and quartz substrates using a vacuum thermal evaporation technique. The effect of the sulfurizing environment on the growth and properties of vacuum-deposited PbS thin film was studied. The ambient sulfurizing environment was created by thermal decomposition of thiourea inside the vacuum chamber during deposition to maintain the stoichiometry and quality of the PbS film. The sulfurizing gas H2S, produced in the thermal decomposition of the solid sulfur containing thiourea readily combines with the cations (Pb2+) without leaving any anions (S2-) at the substrates and also has not produced any excess of sulfur at the substrates. The deposited film was characterized by optical spectroscopy, x-ray diffraction patterns, scanning electron micrographs with energy dispersive analysis of x-rays, and atomic force micrographs. The physical characterization of the deposited PbS film revealed that the surface of film grown in the sulfurizing environment improved and contained more stoichiometric sulfur in comparison to film deposited without the sulfurizing environment.

  7. Self-terminating growth of platinum films by electrochemical deposition.

    Science.gov (United States)

    Liu, Yihua; Gokcen, Dincer; Bertocci, Ugo; Moffat, Thomas P

    2012-12-07

    A self-terminating rapid electrodeposition process for controlled growth of platinum (Pt) monolayer films from a K(2)PtCl(4)-NaCl electrolyte has been developed that is tantamount to wet atomic layer deposition. Despite the deposition overpotential being in excess of 1 volt, Pt deposition was quenched at potentials just negative of proton reduction by an alteration of the double-layer structure induced by a saturated surface coverage of underpotential deposited H (H(upd)). The surface was reactivated for further Pt deposition by stepping the potential to more positive values, where H(upd) is oxidized and fresh sites for the adsorption of PtCl(4)(2-) become available. Periodic pulsing of the potential enables sequential deposition of two-dimensional Pt layers to fabricate films of desired thickness, relevant to a range of advanced technologies.

  8. Thin-film organic photonics molecular layer deposition and applications

    CERN Document Server

    Yoshimura, Tetsuzo

    2011-01-01

    Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves ""three-dimensional growth"". MLD facilitates dot-by-dot--o

  9. Chemical vapor deposition reactor. [providing uniform film thickness

    Science.gov (United States)

    Chern, S. S.; Maserjian, J. (Inventor)

    1977-01-01

    An improved chemical vapor deposition reactor is characterized by a vapor deposition chamber configured to substantially eliminate non-uniformities in films deposited on substrates by control of gas flow and removing gas phase reaction materials from the chamber. Uniformity in the thickness of films is produced by having reactive gases injected through multiple jets which are placed at uniformally distributed locations. Gas phase reaction materials are removed through an exhaust chimney which is positioned above the centrally located, heated pad or platform on which substrates are placed. A baffle is situated above the heated platform below the mouth of the chimney to prevent downdraft dispersion and scattering of gas phase reactant materials.

  10. Aluminosilicate glass thin films elaborated by pulsed laser deposition

    Science.gov (United States)

    Carlier, Thibault; Saitzek, Sébastien; Méar, François O.; Blach, Jean-François; Ferri, Anthony; Huvé, Marielle; Montagne, Lionel

    2017-03-01

    In the present work, we report the elaboration of aluminosilicate glass thin films by Pulsed Laser Deposition at various temperatures deposition. The amorphous nature of glass thin films was highlighted by Grazing Incidence X-Ray Diffraction and no nanocristallites were observed in the glassy matrix. Chemical analysis, obtained with X-ray Photoelectron Spectroscopy and Time of Flight Secondary Ion Mass Spectroscopy, showed a good transfer and homogeneous elementary distribution with of chemical species from the target to the film a. Structural studies performed by Infrared Spectroscopy showed that the substrate temperature plays an important role on the bonding configuration of the layers. A slight shift of Si-O modes to larger wavenumber was observed with the synthesis temperature, assigned to a more strained sub-oxide network. Finally, optical properties of thins film measured by Spectroscopic Ellipsometry are similar to those of the bulk aluminosilicate glass, which indicate a good deposition of aluminosilicate bulk glass.

  11. Aerosol deposition of (Cu,Ti) substituted bismuth vanadate films

    Energy Technology Data Exchange (ETDEWEB)

    Exner, Jörg, E-mail: Functional.Materials@Uni-Bayreuth.de [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany); Fuierer, Paul [Materials and Metallurgical Engineering Department, New Mexico Institute of Mining and Technology, Socorro, NM 87801 (United States); Moos, Ralf [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany)

    2014-12-31

    Bismuth vanadate, Bi{sub 4}V{sub 2}O{sub 11}, and related compounds with various metal (Me) substitutions, Bi{sub 4}(Me{sub x}V{sub 1−x}){sub 2}O{sub 11−δ}, show some of the highest ionic conductivities among the known solid oxide electrolytes. Films of Cu and Ti substituted bismuth vanadate were prepared by an aerosol deposition method, a spray coating process also described as room temperature impact consolidation. Resultant films, several microns in thickness, were dense with good adhesion to the substrate. Scanning electron microscopy and high temperature X-ray diffraction were used to monitor the effects of temperature on the structure and microstructure of the film. The particle size remained nano-scale while microstrain decreased rapidly up to 500 °C, above which coarsening and texturing increased rapidly. Impedance measurements of films deposited on inter-digital electrodes revealed an annealing effect on the ionic conductivity, with the conductivity exceeding that of a screen printed film, and approaching that of bulk ceramic. - Highlights: • Cu and Ti doped bismuth vanadate films were prepared by aerosol deposition (AD). • Dense 3–5 μm thick films were deposited on alumina, silicon and gold electrodes. • Annealing of the AD-layer increases the conductivity by 1.5 orders of magnitude. • Effect of temperature on structure and microstructure was investigated.

  12. Picosecond and subpicosecond pulsed laser deposition of Pb thin films

    Directory of Open Access Journals (Sweden)

    F. Gontad

    2013-09-01

    Full Text Available Pb thin films were deposited on Nb substrates by means of pulsed laser deposition (PLD with UV radiation (248 nm, in two different ablation regimes: picosecond (5 ps and subpicosecond (0.5 ps. Granular films with grain size on the micron scale have been obtained, with no evidence of large droplet formation. All films presented a polycrystalline character with preferential orientation along the (111 crystalline planes. A maximum quantum efficiency (QE of 7.3×10^{-5} (at 266 nm and 7 ns pulse duration was measured, after laser cleaning, demonstrating good photoemission performance for Pb thin films deposited by ultrashort PLD. Moreover, Pb thin film photocathodes have maintained their QE for days, providing excellent chemical stability and durability. These results suggest that Pb thin films deposited on Nb by ultrashort PLD are a noteworthy alternative for the fabrication of photocathodes for superconductive radio-frequency electron guns. Finally, a comparison with the characteristics of Pb films prepared by ns PLD is illustrated and discussed.

  13. Deposition of antimony telluride thin film by ECALE

    Institute of Scientific and Technical Information of China (English)

    GAO; Xianhui; YANG; Junyou; ZHU; Wen; HOU; Jie; BAO; Siqian; FAN; Xi'an; DUAN; Xingkai

    2006-01-01

    The process of Sb2Te3 thin film growth on the Pt substrate by electrochemical atomic layer epitaxy (ECALE) was studied. Cyclic voltammetric scanning was performed to analyze the electrochemical behavior of Te and Sb on the Pt substrate. Sb2Te3 film was formed using an automated flow deposition system by alternately depositing Te and Sb atomic layers for 400 circles. The deposited Sb2Te3 films were characterized by XRD, EDX, FTIR and FESEM observation. Sb2Te3 compound structure was confirmed by XRD pattern and agreed well with the results of EDX quantitative analysis and coulometric analysis. FESEM micrographs showed that the deposit was composed of fine nano particles with size of about 20 nm. FESEM image of the cross section showed that the deposited films were very smooth and dense with thickness of about 190 nm. The optical band gap of the deposited Sb2Te3 film was determined as 0.42 eV by FTIR spectroscopy, and it was blue shifted in comparison with that of the bulk Sb2Te3 single crystal due to its nanocrystalline microstructure.

  14. UV laser deposition of metal films by photogenerated free radicals

    Science.gov (United States)

    Montgomery, R. K.; Mantei, T. D.

    1986-01-01

    A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

  15. Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films

    Directory of Open Access Journals (Sweden)

    Chang-Ho Choi

    2014-05-01

    Full Text Available State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer opportunities to fabricate compound semiconductors at lower temperatures and lower capital costs. Among many solution-based deposition processes, chemical bath deposition is an attractive technique for depositing semiconductor films, owing to its low temperature, low cost and large area deposition capability. Chemical bath deposition processes are mainly performed using batch reactors, where all reactants are fed into the reactor simultaneously and products are removed after the processing is finished. Consequently, reaction selectivity is difficult, which can lead to unwanted secondary reactions. Microreactor-assisted solution deposition processes can overcome this limitation by producing short-life molecular intermediates used for heterogeneous thin film synthesis and quenching the reaction prior to homogeneous reactions. In this paper, we present progress in the synthesis and deposition of semiconductor thin films with a focus on CdS using microreactor-assisted solution deposition and provide an overview of its prospect for scale-up.

  16. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  17. Sputter deposited Terfenol-D thin films for multiferroic applications

    Science.gov (United States)

    Mohanchandra, K. P.; Prikhodko, S. V.; Wetzlar, K. P.; Sun, W. Y.; Nordeen, P.; Carman, G. P.

    2015-09-01

    In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm) with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011) cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10-6.

  18. High-quality AlN films grown on chemical vapor-deposited graphene films

    Directory of Open Access Journals (Sweden)

    Chen Bin-Hao

    2016-01-01

    Full Text Available We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  19. Large-Scale Graphene Film Deposition for Monolithic Device Fabrication

    Science.gov (United States)

    Al-shurman, Khaled

    Since 1958, the concept of integrated circuit (IC) has achieved great technological developments and helped in shrinking electronic devices. Nowadays, an IC consists of more than a million of compacted transistors. The majority of current ICs use silicon as a semiconductor material. According to Moore's law, the number of transistors built-in on a microchip can be double every two years. However, silicon device manufacturing reaches its physical limits. To explain, there is a new trend to shrinking circuitry to seven nanometers where a lot of unknown quantum effects such as tunneling effect can not be controlled. Hence, there is an urgent need for a new platform material to replace Si. Graphene is considered a promising material with enormous potential applications in many electronic and optoelectronics devices due to its superior properties. There are several techniques to produce graphene films. Among these techniques, chemical vapor deposition (CVD) offers a very convenient method to fabricate films for large-scale graphene films. Though CVD method is suitable for large area growth of graphene, the need for transferring a graphene film to silicon-based substrates is required. Furthermore, the graphene films thus achieved are, in fact, not single crystalline. Also, graphene fabrication utilizing Cu and Ni at high growth temperature contaminates the substrate that holds Si CMOS circuitry and CVD chamber as well. So, lowering the deposition temperature is another technological milestone for the successful adoption of graphene in integrated circuits fabrication. In this research, direct large-scale graphene film fabrication on silicon based platform (i.e. SiO2 and Si3N4) at low temperature was achieved. With a focus on low-temperature graphene growth, hot-filament chemical vapor deposition (HF-CVD) was utilized to synthesize graphene film using 200 nm thick nickel film. Raman spectroscopy was utilized to examine graphene formation on the bottom side of the Ni film

  20. Defect control in room temperature deposited cadmium sulfide thin films by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hernandez-Como, N. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Martinez-Landeros, V. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Centro de Investigación en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, México (Mexico); Mejia, I. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Aguirre-Tostado, F.S. [Centro de Investigación en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, México (Mexico); Nascimento, C.D.; Azevedo, G. de M; Krug, C. [Instituto de Física, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900 (Brazil); Quevedo-Lopez, M.A., E-mail: mquevedo@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States)

    2014-01-01

    The control of defects in cadmium sulfide thin films and its impact on the resulting CdS optical and electrical characteristics are studied. Sulfur vacancies and cadmium interstitial concentrations in the CdS films are controlled using the ambient pressure during pulsed laser deposition. CdS film resistivities ranging from 10{sup −1} to 10{sup 4} Ω-cm are achieved. Hall Effect measurements show that the carrier concentration ranges from 10{sup 19} to 10{sup 13} cm{sup −3} and is responsible for the observed resistivity variation. Hall mobility varies from 2 to 12 cm{sup 2}/V-s for the same pressure regime. Although the energy bandgap remains unaffected (∼ 2.42 eV), the optical transmittance is reduced due to the increase of defects in the CdS films. Rutherford back scattering spectroscopy shows the dependence of the CdS films stoichiometry with deposition pressure. The presence of CdS defects is attributed to more energetic species reaching the substrate, inducing surface damage in the CdS films during pulsed laser deposition. - Highlights: • CdS thin films deposited by pulsed laser deposition at room temperature. • The optical, electrical and structural properties were evaluated. • Carrier concentration ranged from 10{sup 19} to 10{sup 13} cm{sup −3}. • The chemical composition was studied by Rutherford back scattering. • The density of sulfur vacancies and cadmium interstitial was varied.

  1. CdS nanoparticles sensitization of Al-doped ZnO nanorod array thin film with hydrogen treatment as an ITO/FTO-free photoanode for solar water splitting.

    Science.gov (United States)

    Hsu, Chih-Hsiung; Chen, Dong-Hwang

    2012-10-25

    Aluminum-doped zinc oxide (AZO) nanorod array thin film with hydrogen treatment possesses the functions of transparent conducting oxide thin film and 1-D nanostructured semiconductor simultaneously. To enhance the absorption in the visible light region, it is sensitized by cadmium sulfide (CdS) nanoparticles which efficiently increase the absorption around 460 nm. The CdS nanoparticles-sensitized AZO nanorod array thin film with hydrogen treatment exhibits significantly improved photoelectrochemical property. After further heat treatment, a maximum short current density of 5.03 mA cm-2 is obtained under illumination. They not only are much higher than those without CdS nanoparticles sensitization and those without Al-doping and/or hydrogen treatment, but also comparable and even slightly superior to some earlier works for the CdS-sensitized zinc oxide nanorod array thin films with indium tin oxide (ITO) or fluorine-doped tin oxide (FTO) as substrates. This demonstrated successfully that the AZO nanorod array thin film with hydrogen treatment is quite suitable as an ITO/FTO-free photoanode and has great potentials in solar water splitting after sensitization by quantum dots capable of visible light absorption.

  2. Growth of tantalum pentoxide film by pulsed laser deposition

    Science.gov (United States)

    Zhang, Jun-Ying; Fang, Qi; Boyd, Ian W.

    1999-01-01

    Thin films of Ta 2O 5 have been deposited on quartz and silicon substrates by 532-nm (Nd:YAG) pulsed laser deposition (PLD) in various O 2 gas environments. The influence of the deposition parameters, such as oxygen pressure, substrate temperature and annealing under UV irradiation using a 172-nm excimer lamp, on the properties of the grown films, has been studied. The refractive index of the films increases with increasing pressure of O 2. X-ray diffraction measurements show that the as-deposited films are amorphous at temperatures below 500°C and possess orthorhombic (β-Ta 2O 5) crystal structure at temperatures above 600°C. The optical properties determined by UV spectrophotometry also strongly depend on the deposition parameters. At O 2 pressures above 0.15 mbar, the refractive index of the films was about 2.12 which is close to the bulk Ta 2O 5 value of 2.2. Optical transmittance around 85% in the visible region of the spectrum was obtained at an oxygen pressure of 0.2 mbar.

  3. Pulsed laser deposition of niobium nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Farha, Ashraf Hassan, E-mail: ahass006@odu.edu; Elsayed-Ali, Hani E., E-mail: helsayed@odu.edu [Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, VA 23529 (United States); Applied Research Center, Jefferson National Accelerator Facility, Newport News, VA 23606 (United States); Department of Physics, Faculty of Science, Ain Shams University, Cairo 11566 (Egypt); Ufuktepe, Yüksel, E-mail: ufuk@cu.edu.tr [Department of Physics, University of Cukurova, 01330 Adana (Turkey); Myneni, Ganapati, E-mail: rao@jlab.org [Thomas Jefferson National Accelerator Facility, Newport News, Virginia 23606 (United States)

    2015-12-04

    Niobium nitride (NbN{sub x}) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbN{sub x} films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ∼40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbN{sub x} films from mixed β-Nb{sub 2}N and cubic δ-NbN phases to single hexagonal β-Nb{sub 2}N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbN{sub x} deposited on Si(100) were also investigated. The NbN{sub x} films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbN{sub x} film morphology and phase.

  4. Epitaxial yttrium iron garnet films grown by pulsed laser deposition

    Science.gov (United States)

    Dorsey, P. C.; Bushnell, S. E.; Seed, R. G.; Vittoria, C.

    1993-07-01

    Epitaxial Y3Fe5O12 (YIG) films have been grown by the pulsed laser deposition (PLD) technique on (111) gadolinium gallium garnet substrates. The effect of substrate temperature and oxygen partial pressure on the structure, composition, and magnetic properties of the films was investigated and compared to liquid phase epitaxy YIG films. The results demonstrated that epitaxial YIG films could be prepared under a wide range of deposition conditions, but narrow linewidth (ΔH≂1 Oe) films were producible only at low oxygen partial pressures (O2temperatures (Ts≳800 °C). Since the linewidth of single-crystal YIG is dominated by surface and volume defects and/or impurities, the narrow linewidth indicated that PLD is a viable technique for producing high-quality ferrite films for microwave device applications. In addition, under all deposition conditions (50-1000 mTorr and 700-850 °C) there is a uniaxial axis perpendicular to the film plane. However, at low oxygen pressure the uniaxial anisotropy energy constant Ku is negative while at high oxygen pressure Ku is positive.

  5. CdS films deposited by chemical bath under rotation

    Energy Technology Data Exchange (ETDEWEB)

    Oliva-Aviles, A.I., E-mail: aoliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico); Patino, R.; Oliva, A.I. [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico)

    2010-08-01

    Cadmium sulfide (CdS) films were deposited on rotating substrates by the chemical bath technique. The effects of the rotation speed on the morphological, optical, and structural properties of the films were discussed. A rotating substrate-holder was fabricated such that substrates can be taken out from the bath during the deposition. CdS films were deposited at different deposition times (10, 20, 30, 40 and 50 min) onto Corning glass substrates at different rotation velocities (150, 300, 450, and 600 rpm) during chemical deposition. The chemical bath was composed by CdCl{sub 2}, KOH, NH{sub 4}NO{sub 3} and CS(NH{sub 2}){sub 2} as chemical reagents and heated at 75 deg. C. The results show no critical effects on the band gap energy and the surface roughness of the CdS films when the rotation speed changes. However, a linear increase on the deposition rate with the rotation energy was observed, meanwhile the stoichiometry was strongly affected by the rotation speed, resulting a better 1:1 Cd/S ratio as speed increases. Rotation effects may be of interest in industrial production of CdTe/CdS solar cells.

  6. Control of crystallite size in diamond film chemical vapor deposition

    Science.gov (United States)

    Moran, Mark B.; Johnson, Linda F.; Klemm, Karl A.

    1992-12-01

    In depositing an adhering, continuous, polycrystalline diamond film of optical or semiconductor quality on a substrate, as by forming on the substrate a layer of a refractory nitride interlayer and depositing diamond on the interlayer without mechanical treatment or seeding of the substrate or the interlayer, the substrate is heated in a vacuum chamber containing a microwave activated mixture of hydrogen and a gas including carbon, and the size of deposited diamond crystallites and their rate of deposition selectively varied by a bias voltage applied to the substrate.

  7. Deposition of Cadmium Sulphide Thin Films by Photochemical Deposition and Characterization

    Directory of Open Access Journals (Sweden)

    H.L. Pushpalatha

    2015-03-01

    Full Text Available Deposition of cadmium sulphide (CdS thin films on glass substrates in acidic medium by photochemical deposition (PCD and studies by several characterizations are presented. The structural characterization of the thin films was carried out by XRD. The elemental composition of the thin films was carried out by EDAX. The optical properties have been studied in the wavelength range 200-900 nm and the optical transition has been found to be direct and allowed. The morphological properties are studied by AFM and electrical properties are studied by four probe technique.

  8. Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition

    Science.gov (United States)

    Jhang, Pei-Ci; Lu, Chi-Pin; Shieh, Jung-Yu; Yang, Ling-Wu; Yang, Tahone; Chen, Kuang-Chao; Lu, Chih-Yuan

    2017-07-01

    An N-rich silicon nitride film, with a lower refractive index (RI) than the stoichiometric silicon nitride (RI = 2.01), was deposited by alternating the exposure of dichlorosilane (DCS, SiH2Cl2) and that of ammonia (NH3) in a plasma-enhanced atomic layer deposition (PEALD) process. In this process, the plasma ammonia was easily decomposed to reactive radicals by RF power activating so that the N-rich silicon nitride was easily formed by excited ammonia radicals. The growth kinetics of N-rich silicon nitride were examined at various deposition temperatures ranging from 400 °C to 630 °C; the activation energy (Ea) decreased as the deposition temperature decreased below 550 °C. N-rich silicon nitride film with a wide range of values of refractive index (RI) (RI = 1.86-2.00) was obtained by regulating the deposition temperature. At the optimal deposition temperature, the effects of RF power, NH3 flow rate and NH3 flow time were on the characteristics of the N-rich silicon nitride film were evaluated. The results thus reveal that the properties of the N-rich silicon nitride film that was formed by under plasma-enhanced atomic layer deposition (PEALD) are dominated by deposition temperature. In charge trap flash (CTF) study, an N-rich silicon nitride film was applied to MAONOS device as a charge-trapping layer. The films exhibit excellent electron trapping ability and favor a fresh cell data retention performance as the deposition temperature decreased.

  9. Aspects of thin film deposition on granulates by physical vapor deposition

    Science.gov (United States)

    Eder, Andreas; Schmid, Gerwin H. S.; Mahr, Harald; Eisenmenger-Sittner, Christoph

    2016-11-01

    Thin film and coating technology has entered fields which may show significant deviations from classical coating applications where films are deposited on plane, sometimes large substrates. Often surfaces of small and irregularly shaped bodies have to be improved in respect to electrical, thermal or mechanical properties. Film deposition and characterization on such small substrates is not a trivial task. This specially holds for methods based on Physical Vapor Deposition (PVD) processes such as sputter deposition and its ion- and plasma assisted varieties. Due to their line of sight nature a key issue for homogenous films is efficient intermixing. If this problem is mastered, another task is the prediction and determination of the film thickness on single particles as well as on large scale ensembles thereof. In this work a mechanism capable of uniformly coating up to 1000 cm3 of granulate with particle sizes ranging from approx. 10 μm to 150 μm by magnetron sputtering is thoroughly described. A method for predicting the average film thickness on the particles is presented and tested for several differently shaped objects like microspheres, irregular grains of sinter powder or micro diamonds. For assessing the film thickness on single particles as well as on particle ensembles several complementary methods based on optics, X-ray analysis and gravimetry are employed. Their respective merits and limitations are discussed. Finally an outlook on adapting the described technology for surface modification by plasma based reactive and non-reactive processes is given.

  10. Deposition of Cu seed layer film by supercritical fluid deposition for advanced interconnects

    Institute of Scientific and Technical Information of China (English)

    Zhao Bin; Zhao Ming-Tao; Zhang Yan-Fei; Yang Jun-He

    2013-01-01

    The deposition of a Cu seed layer film is investigated by supercritical fluid deposition (SCFD) using H2 as a reducing agent for Bis(2,2,6,6-tetramethyl-3,5-heptanedionato) copper in supercritical CO2 (scCO2).The effects of deposition temperature,precursor,and H2 concentration are investigated to optimize Cu deposition.Continuous metallic Cu films are deposited on Ru substrates at 190 ℃ when a 0.002 mol/L Cu precursor is introduced with 0.75 mol/L H2.A Cu precursor concentration higher than 0.002 mol/L is found to have negative effects on the surface qualities of Cu films.For a H2concentration above 0.56 mol/L,the root-mean-square (RMS) roughness of a Cu film decreases as the H2 concentration increases.Finally,a 20-nm thick Cu film with a smooth surface,which is required as a seed layer in advanced interconnects,is successfully deposited at a high H2 concentration (0.75 mol/L).

  11. Plasma deposited fluorinated films on porous membranes

    Energy Technology Data Exchange (ETDEWEB)

    Gancarz, Irena [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Bryjak, Marek, E-mail: marek.bryjak@pwr.edu.pl [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Kujawski, Jan; Wolska, Joanna [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Kujawa, Joanna; Kujawski, Wojciech [Nicolaus Copernicus University, Faculty of Chemistry, 7 Gagarina St., 87-100 Torun (Poland)

    2015-02-01

    75 KHz plasma was used to modify track etched poly(ethylene terephthalate) membranes and deposit on them flouropolymers. Two fluorine bearing monomers were used: perflourohexane and hexafluorobenzene. The modified surfaces were analyzed by means of attenuated total reflection infra-red spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy and wettability. It was detected that hexaflourobenxene deposited to the larger extent than perflourohaxane did. The roughness of surfaces decreased when more fluoropolymer was deposited. The hydrophobic character of surface slightly disappeared during 20-days storage of hexaflourobenzene modified membrane. Perfluorohexane modified membrane did not change its character within 120 days after modification. It was expected that this phenomenon resulted from post-reactions of oxygen with radicals in polymer deposits. The obtained membranes could be used for membrane distillation of juices. - Highlights: • Plasma deposited hydrophobic layer of flouropolymers. • Deposition degree affects the surface properties. • Hydrohilization of surface due to reaction of oxygen with entrapped radicals. • Possibility to use modified porous membrane for water distillation and apple juice concentration.

  12. Ultraviolet laser deposition of graphene thin films without catalytic layers

    KAUST Repository

    Sarath Kumar, S. R.

    2013-01-09

    In this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.

  13. Shallow bath chemical deposition of CdS thin film

    Energy Technology Data Exchange (ETDEWEB)

    Lo, Y.S. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Choubey, R.K. [Department of Applied Physics, Birla Institute of Technology, Mesra, Ranchi, 835 215 (India); Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China); Yu, W.C. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Hsu, W.T. [Green Energy and Environmental Research Laboratory, Industrial Technology Research Institute, Hsin-Chu, Taiwan (China); Lan, C.W., E-mail: cwlan@ntu.edu.tw [Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China)

    2011-10-31

    Cadmium sulfide thin film was grown by shallow chemical bath deposition technique. This technique used a highly conducted hot plate to heat the substrate, while using a shallow bath for higher thermal gradients. As a result, large area uniformity could be achieved and the homogeneous nucleation was suppressed. More importantly, the solution used was greatly reduced, which is crucial for cost reduction in practice. The effects of temperature and shaking on the growth kinetics and film properties were investigated. The reaction activation energy was obtained to be 0.84 eV, and was not affected much by shaking indicating that the deposition is essentially reaction controlled. Furthermore, the films deposited at low or high temperature conditions had better photoconductivity.

  14. Cobalt Xanthate Thin Film with Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    İ. A. Kariper

    2013-01-01

    Full Text Available Cobalt xanthate thin films (CXTFs were successfully deposited by chemical bath deposition, onto amorphous glass substrates, as well as on p- and n-silicon, indium tin oxide, and poly(methyl methacrylate. The structure of the films was analyzed by far-infrared spectrum (FIR, mid-infrared (MIR spectrum, nuclear magnetic resonance (NMR, and scanning electron microscopy (SEM. These films were investigated from their structural, optical, and electrical properties point of view. Electrical properties were measured using four-point method, whereas optical properties were investigated via UV-VIS spectroscopic technique. Uniform distribution of grains was clearly observed from the photographs taken by scanning electron microscope (SEM. The transmittance was about 70–80% (4 hours, 50°C. The optical band gap of the CXTF was graphically estimated to be 3.99–4.02 eV. The resistivity of the films was calculated as 22.47–75.91 Ω·cm on commercial glass depending on film thickness and 44.90–73.10 Ω ·cm on the other substrates. It has been observed that the relative resistivity changed with film thickness. The MIR and FIR spectra of the films were in agreement with the literature analogues. The expected peaks of cobalt xanthate were observed in NMR analysis on glass. The films were dipped in chloroform as organic solvent and were analyzed by NMR.

  15. Electron-beam deposition of vanadium dioxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Marvel, R.E.; Appavoo, K. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Choi, B.K. [Vanderbilt University, Department of Electrical Engineering and Computer Science, Nashville, TN (United States); Nag, J. [Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States); Haglund, R.F. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Vanderbilt University, Institute for Nanoscale Science and Engineering, Nashville, TN (United States); Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States)

    2013-06-15

    Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass. (orig.)

  16. Microwave annealing effects on ZnO films deposited by atomic layer deposition

    Institute of Scientific and Technical Information of China (English)

    Zhao Shirui; Dong Yabin; Yu Mingyan; Guo Xiaolong; Xu Xinwei; Jing Yupeng; Xia Yang

    2014-01-01

    Zinc oxide thin films deposited on glass substrate at 150 ℃ by atomic layer deposition were annealed by the microwave method at temperatures below 500 ℃.The microwave annealing effects on the structural and luminescent properties of ZnO films have been investigated by X-ray diffraction and photoluminescence.The results show that the MWA process can increase the crystal quality of ZnO thin films with a lower annealing temperature than RTA and relatively decrease the green luminescence of ZnO films.The observed changes have demonstrated that MWA is a viable technique for improving the crystalline quality of ZnO thin film on glass.

  17. Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YAO Kailun; ZHENG Jianwan; LIU Zuli; JIA Lihui

    2007-01-01

    In this paper,the characterization of thin films,deposited with the precursor ferrocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was investigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic Force Microscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and superconducting Quantum Interference Device(SQUID).It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks.The surface roughness is about 36 nm.From the results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,and carbon is combined with oxygen in different forms under different supply-powers.The hysteresis loops indicate that the film is of soft magnetism.

  18. Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Li, Dong-ling; Feng, Xiao-fei; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-07-01

    Stress controllable silicon nitride (SiNx) films deposited by plasma enhanced chemical vapor deposition (PECVD) are reported. Low stress SiNx films were deposited in both high frequency (HF) mode and dual frequency (HF/LF) mode. By optimizing process parameters, stress free (-0.27 MPa) SiNx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited SiNx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit (IC), micro-electro-mechanical systems (MEMS) and bio-MEMS.

  19. Glancing angle deposition of thin films engineering the nanoscale

    CERN Document Server

    Hawkeye, Matthew M; Brett, Michael J

    2014-01-01

    This book provides a highly practical treatment of GLAD technology, gathering existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: History and development of GLAD techniquesProperties and Characterization of GLAD fabricated filmsDesign and engineering of optical GLAD films including fabrication and testingPost-deposition processing and integrationDeposition systems for GLAD fabrication Also includes a patent survey of relevant literature and a survey of GLAD's wide range of material properties and diverse applications.

  20. Spray pyrolysis deposition of indium sulphide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Otto, K.; Katerski, A.; Mere, A.; Volobujeva, O.; Krunks, M., E-mail: malle@staff.ttu.e

    2011-03-01

    In{sub 2}S{sub 3} thin films were grown by the chemical spray pyrolysis (CSP) method using the pneumatic spray set-up and compressed air as a carrier gas. Aqueous solutions containing InCl{sub 3} and SC(NH{sub 2}){sub 2} at a molar ratio of In/S = 1/3 and 1/6 were deposited onto preheated glass sheets at substrate temperatures T{sub s} = 205-410 {sup o}C. The obtained films were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM,) optical transmission spectra, X-ray photoelectron spectroscopy (XPS) and energy dispersive spectroscopy (EDS). According to XRD, thin films deposited at T{sub s} = 205-365 {sup o}C were composed of the (0 0 12) orientated tetragonal {beta}-In{sub 2}S{sub 3} phase independent of the In/S ratio in the spray solution. Depositions performed at T{sub s} = 410 {sup o}C led to the formation of the In{sub 2}O{sub 3} phase, preferably when the 1/3 solution was sprayed. Post-deposition annealing in air indicated that oxidation of the sulphide phase has a minor role in the formation of In{sub 2}O{sub 3} at temperatures up to 450 {sup o}C. In{sub 2}S{sub 3} films grown at T{sub s} below 365 {sup o}C exhibited transparency over 70% in the visible spectral region and E{sub g} of 2.90-2.96 eV for direct and 2.15-2.30 eV for indirect transitions, respectively. Film thickness and chlorine content decreased with increasing deposition temperatures. The XPS study revealed that the In/S ratio in the spray solution had a significant influence on the content of oxygen (Me-O, BE = 530.0 eV) in the In{sub 2}S{sub 3} films deposited in the temperature range of 205-365 {sup o}C. Both XPS and EDS studies confirmed that oxygen content in the films deposited using the solution with the In/S ratio of 1/6 was substantially lower than in the films deposited with the In/S ratio of 1/3.

  1. X-ray Photoelectron Spectroscopy Study of Indium Tin Oxide Films Deposited at Various Oxygen Partial Pressures

    Science.gov (United States)

    Peng, Shou; Cao, Xin; Pan, Jingong; Wang, Xinwei; Tan, Xuehai; Delahoy, Alan E.; Chin, Ken K.

    2017-02-01

    Here, a systematic experimental study on indium tin oxide (ITO) films is presented to investigate the effects of oxygen partial pressure on the film's electrical properties. The results of Hall measurements show that adding more oxygen in the sputtering gas has negative influences on the electrical conductivity of ITO films. As O2/(O2 + Ar)% in the sputtering gas is increased from 0 to 6.98%, the resistivity of ITO film rises almost exponentially from 7.9 × 10-4 to 4.1 × 10-2 Ω cm, with the carrier density decreasing from 4.8 × 1020 to 5.4 × 1018 cm-3. The origins of these negative effects are discussed with focuses on the concentration of ionized impurities and the scattering of grain barriers. Extensive x-ray photoelectron spectroscopy (XPS) analyses were employed to gain insight into the concentration of ionized impurities, demonstrating a strong correlation between the oxygen vacancy concentration and the carrier density in ITO films as a function of sputtering O2 partial pressure. Other microstructural characterization techniques including x-ray diffraction (XRD), high-magnification scanning electron microscopy (SEM) and scanning transmission electron microscopy (STEM) analyses were used to evaluate the average grain size of ITO films. For ITO films that have carrier density above 1019 cm-3, scattering on grain boundaries and other crystallographic defects show negligible effects on the carrier transport. The results point to the oxygen vacancy concentration that dictates the carrier density and, thus, the resistivity of magnetron-sputtered ITO films.

  2. Fabrication and characterization of vacuum deposited fluorescein thin films

    Energy Technology Data Exchange (ETDEWEB)

    Jalkanen, Pasi, E-mail: pasi.jalkanen@gmail.co [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kulju, Sampo, E-mail: sampo.j.kulju@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Arutyunov, Konstantin, E-mail: konstantin.arutyunov@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Antila, Liisa, E-mail: liisa.j.antila@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Myllyperkioe, Pasi, E-mail: pasi.myllyperkio@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Ihalainen, Teemu, E-mail: teemu.o.ihalainen@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kaeaeriaeinen, Tommi, E-mail: tommi.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Kaeaeriaeinen, Marja-Leena, E-mail: marja-leena.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Korppi-Tommola, Jouko, E-mail: jouko.korppi-tommola@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland)

    2011-03-31

    Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO{sub 2} coating. Surface topology, absorption and emission spectra of the films depend on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially forms islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO{sub 2} is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at {lambda} = 458 nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO{sub 2} is quenched due to the effective electron transfer to the semiconductor conduction band.

  3. The Effect of Deposition Time on Textured Magnesium Diboride Thick Films Fabricated by Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    W. G. Mutia

    2004-12-01

    Full Text Available MgB2 powders suspended in ethanol were electrophoretically deposited on high-purity molybdenum substrates having dimensions of 1 x 0.3 x 0.01 cm. The said substrate was set as the cathode and was placed 0.5 cm away from a graphite rod anode. A current density of ~0.02 mA/cm2 and a voltage of 600 V were applied. The effect of deposition time was studied by varying it as follows: 15 s, 30 s, 1 min, and 2 min. Heat treatment at 950 oC for 3 h was done after deposition. MgB2 thick films were successfully fabricated for the deposition carried out for 2 min. Deposition times less than 2 min resulted in insufficient deposited powder; hence formation of MgB2 was not facilitated. Films deposited at 15 and 30 s have good surface characteristics, wherein no microcracks were present. X-ray diffraction and surface image analysis reveal that the deposited films have a preferred orientation along the (10l direction.

  4. Morphological Study Of Palladium Thin Films Deposited By Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Salcedo, K L; Rodriguez, C A [Grupo Plasma Laser y Aplicaciones, Ingenieria Fisica, Universidad Tecnologica de Pereira (Colombia); Perez, F A [WNANO, West Virginia University (United States); Riascos, H [Grupo Plasma Laser y Aplicaciones, Departamento de Fisica, Universidad Tecnologica de Pereira (Colombia)

    2011-01-01

    This paper presents a morphological analysis of thin films of palladium (Pd) deposited on a substrate of sapphire (Al{sub 2}O{sub 3}) at a constant pressure of 3.5 mbar at different substrate temperatures (473 K, 523 K and 573 K). The films were morphologically characterized by means of an Atomic Force Microscopy (AFM); finding a relation between the roughness and the temperature. A morphological analysis of the samples through AFM was carried out and the roughness was measured by simulating the X-ray reflectivity curve using GenX software. A direct relation between the experimental and simulation data of the Palladium thin films was found.

  5. Alternating deposition films of a polymer and dendrimers bearing diphenylanthracene

    Institute of Scientific and Technical Information of China (English)

    SUN Jing; WANG Liyan; GAO Jian; YU Xi; WANG Zhiqiang

    2005-01-01

    Two generations of carboxyl-terminated poly (aryl ether) dendrimers bearing 9,10-diphenylanthracene cores are designed and synthesized. Alternating deposition of two dendrimers and poly(4-vinylpyridine) is studied with UV-Vis spectroscopy, FT-IR spectroscopy and atomic force microscopy. Experimental results indicate that this method to introduce chromophore into multilayer film can effectively prevent desorption of dye molecule. Moreover, it is found that dendrimer can inhibit the aggregation of fluorophore in film using fluorescence spectroscopy. Increase of dendrimer's generation can enhance fluorescence intensity of each fluorophore. This provides a new approach to design luminescent thin film.

  6. Impact toughness of tungsten films deposited on martensite stainless steel

    Institute of Scientific and Technical Information of China (English)

    HUANG Ning-kang; YANG Bin; WANG De-zhi

    2005-01-01

    Tungsten films were deposited on stainless steel Charpy specimens by magnetron sputtering followed by electron beam heat treatment. Charpy impact tests and scanning electron microscopy were used to investigate the ductile-brittle transition behavior of the specimens. With decreasing test temperature the fracture mode was transformed from ductile to brittle for both kinds of specimens with and without W films. The data of the crack initiation energy, crack propagation energy, impact absorbing energy, fracture time and deflection as well as the fracture morphologies at test temperature of -70 ℃ show that W films can improve the impact toughness of stainless steel.

  7. Oxide films: low-temperature deposition and crystallization

    Science.gov (United States)

    Park, Sangmoon; Herman, Gregory S.; Keszler, Douglas A.

    2003-10-01

    Thin films of CeO 2 and (Ce,Sm)O 2 have been prepared by using the SILAR method of deposition in conjunction with hydrothermal and high-temperature annealing. Low-temperature, low-pressure hydrothermal annealing of amorphous Mn:Zn 2GeO 4 films has lead to the growth of grains having edge lengths near 1 μm. Thick films of crystalline Zn 2SiO 4 exhibiting limited cracking have been prepared by a doctor-blade method also in conjunction with hydrothermal dehydration and annealing.

  8. Correlation between physical properties and growth mechanism of In2S3 thin films fabricated by electrodeposition technique with different deposition times

    Science.gov (United States)

    Braiek, Zied; Gannouni, Mounir; Ben Assaker, Ibtissem; Bardaoui, Afrah; Lamouchi, Amina; Brayek, A.; Chtourou, Radhouane

    2015-10-01

    Indium sulfide (In2S3) thin films were grown on ITO-coated glass substrate using the electrodeposition method. The effect of the deposition time on the structural, morphological, optical and electrical properties of the as-grown In2S3 thin films was studied. XRD spectra of the obtained films reveal the polycrystalline nature of (β-In2S3) with a tetragonal crystal structure along the (109) plane, and exhibit a sharp transition to the (0012) plane when the deposition time is extended beyond 20 min. Using atomic force microscope (AFM), the surface morphology shows a remarkable change in the grain size, thickness, and surface roughness when varying the deposition time. UV-VIS spectrophotometer show that the optical band gap values of In2S3 decrease from about 2.82 to 1.93 eV by extending the electrodeposition duration from 5 to 20 min. All films were found to have an n-type character with a lower electrical resistivity of about 1.8×10-3 Ω cm for films deposited at 20 min.

  9. Deposition of ZnO Films on Freestanding CVD Thick Diamond Films

    Institute of Scientific and Technical Information of China (English)

    SUN Jian; BAI Yi-Zhen; YANG Tian-Peng; XU Yi-Bin; WANG Xin-Sheng; DU Guo-Tong; WU Han-Hua

    2006-01-01

    @@ For ZnO/diamond structured surface acoustic wave (SAW) filters, performance is sensitively dependent on the quality of the ZnO films. In this paper, we prepare highly-oriented and fine grained polycrystalline ZnO thin films with excellent surface smoothness on the smooth nucleation surfaces of freestanding CVD diamond films by metal organic chemical vapour deposition (MOCVD). The properties of the ZnO films are characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), and photoluminescence (PL) spectrum. The influences of the deposition conditions on the quality of ZnO films are discussed briefly. ZnO/freestanding thick-diamond-film layered SAW devices with high response frequencies are expected to be developed.

  10. Cadmium Sulfide Thin Films Deposited onto MWCNT/Polysulfone Substrates by Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    M. Moreno

    2016-01-01

    Full Text Available Cadmium sulfide (CdS thin films were deposited by chemical bath deposition (CBD onto polymeric composites with electric field-aligned multiwall carbon nanotubes (MWCNTs. MWCNT/polysulfone composites were prepared by dispersing low concentrations of MWCNTs within dissolved polysulfone (PSF. An alternating current electric field was “in situ” applied to align the MWCNTs within the dissolved polymer along the field direction until the solvent was evaporated. 80 μm thick solid MWCNT/PSF composites with an electrical conductivity 13 orders of magnitude higher than the conductivity of the neat PSF were obtained. The MWCNT/PSF composites were subsequently used as flexible substrates for the deposition of CdS thin films by CBD. Transparent and adherent CdS thin films with an average thickness of 475 nm were obtained. The values of the energy band gap, average grain size, rms roughness, crystalline structure, and preferential orientation of the CdS films deposited onto the polymeric substrate were very similar to the corresponding values of the CdS deposited onto glass (conventional substrate. These results show that the MWCNT/PSF composites with electric field-tailored MWCNTs represent a suitable option to be used as flexible conducting substrate for CdS thin films, which represents an important step towards the developing of flexible systems for photovoltaic applications.

  11. Coaxial carbon plasma gun deposition of amorphous carbon films

    Science.gov (United States)

    Sater, D. M.; Gulino, D. A.; Rutledge, S. K.

    1984-01-01

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented.

  12. Deposition and characterisation of epitaxial oxide thin films for SOFCs

    KAUST Repository

    Santiso, José

    2010-10-24

    This paper reviews the recent advances in the use of thin films, mostly epitaxial, for fundamental studies of materials for solid oxide fuel cell (SOFC) applications. These studies include the influence of film microstructure, crystal orientation and strain in oxide ionic conducting materials used as electrolytes, such as fluorites, and in mixed ionic and electronic conducting materials used as electrodes, typically oxides with perovskite or perovskite-related layered structures. The recent effort towards the enhancement of the electrochemical performance of SOFC materials through the deposition of artificial film heterostructures is also presented. These thin films have been engineered at a nanoscale level, such as the case of epitaxial multilayers or nanocomposite cermet materials. The recent progress in the implementation of thin films in SOFC devices is also reported. © 2010 Springer-Verlag.

  13. Polyelectrolyte Coacervates Deposited as High Gas Barrier Thin Films.

    Science.gov (United States)

    Haile, Merid; Sarwar, Owais; Henderson, Robert; Smith, Ryan; Grunlan, Jaime C

    2017-01-01

    Multilayer coatings consisting of oppositely charged polyelectrolytes have proven to be extraordinarily effective oxygen barriers but require many processing steps to fabricate. In an effort to prepare high oxygen barrier thin films more quickly, a polyelectrolyte complex coacervate composed of polyethylenimine and polyacrylic acid is prepared. The coacervate fluid is applied as a thin film using a rod coating process. With humidity and thermal post-treatment, a 2 µm thin film reduces the oxygen transmission rate of 0.127 mm poly(ethylene terephthalate) by two orders of magnitude, rivalling conventional oxygen barrier technologies. These films are fabricated in ambient conditions using low-cost, water-based solutions, providing a tremendous opportunity for single-step deposition of polymeric high barrier thin films.

  14. CHEMICALLY DEPOSITED SILVER FILM USED AS A SERS-ACTIVE OVER COATING LAYER FOR POLYMER FILM

    Institute of Scientific and Technical Information of China (English)

    Xiao-ning Liu; Gi Xue; Yun Lu; Jun Zhang; Fen-ting Li; Chen-chen Xue; Stephen Z.D. Cheng

    2001-01-01

    When colloidal silver particles were chemically deposited onto polymer film as an over-coating layer, surfaceenhanced Raman scattering (SERS) spectra could be collected for the surface analysis. SERS measurements of liquid crystal film were successfully performed without disturbing the surface morphology.

  15. Environmentally stable sputter-deposited thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sharp, D.J.

    1978-03-01

    Accelerated corrosion data are presented for the titanium-silver and chrome-gold thin film metallization systems presently used at Sandia Laboratories. Improvements in corrosion, hence reliability, as a result of interposing a thin intermediate layer of either platinum or palladium are shown. Potentiometric measurements showing the alteration of corrosion potential with the use of palladium for the titanium-silver system are also presented.

  16. RF sputtering deposited a-IGZO films for LCD alignment layer application

    Science.gov (United States)

    Wu, G. M.; Liu, C. Y.; Sahoo, A. K.

    2015-11-01

    In this paper, amorphous indium gallium zinc oxide (a-IGZO) inorganic films were deposited at a fixed oblique angle using radio-frequency sputtering on indium tin oxide (ITO) glass as alternative alignment layer for liquid crystal displays. A series of experiments have been carried out to reveal the physical characteristics of the a-IGZO films, such as optical transmittance, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The special treatment a-IGZO films were used to fabricate liquid crystal (LC) cells and investigate the performances of these cells. Pretilt angles were measured with anti-parallel LC cells and voltage-transmittance (V-T) curve, contrast ratio, and response time were evaluated with optically compensated bend (OCB) LC cells. The electro-optical characteristics of the aligned homogenous LCs, and OCB mode cells based on the a-IGZO alignment layer were compared to those based on rubbing processed polyimide (PI). The results showed that the average transmittance in the visible wavelength range was higher than 90% for the a-IGZO alignment layer. The LC pretilt angle has been determined at about 6°. The evaluted cell critical voltage at maximum transmittance was 1.8 V, lower than the control cell using PI alignment layer. The OCB cell rise time and fall time were 1.55 ms and 3.49 ms, respectivly. A very quick response time of 5.04 ms has thus been achived. In addition, the study of V-T characteristics suggested higher contrast ratio for LCD display applications.

  17. Aerosol-assisted chemical vapor deposition of tungsten oxide films and nanorods from oxo tungsten(VI) fluoroalkoxide precursors.

    Science.gov (United States)

    Kim, Hankook; Bonsu, Richard O; O'Donohue, Christopher; Korotkov, Roman Y; McElwee-White, Lisa; Anderson, Timothy J

    2015-02-04

    Aerosol-assisted chemical vapor deposition (AACVD) of WOx was demonstrated using the oxo tungsten(VI) fluoroalkoxide single-source precursors, WO[OCCH3(CF3)2]4 and WO[OC(CH3)2CF3]4. Substoichiometric amorphous tungsten oxide thin films were grown on indium tin oxide (ITO) substrates in nitrogen at low deposition temperature (100-250 °C). At growth temperatures above 300 °C, the W18O49 monoclinic crystalline phase was observed. The surface morphology and roughness, visible light transmittance, electrical conductivity, and work function of the tungsten oxide materials are reported. The solvent and carrier gas minimally affected surface morphology and composition at low deposition temperature; however, material crystallinity varied with solvent choice at higher temperatures. The work function of the tungsten oxide thin films grown between 150 and 250 °C was determined to be in the range 5.0 to 5.7 eV, according to ultraviolet photoelectron spectroscopy (UPS).

  18. In situ measurement of conductivity during nanocomposite film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Blattmann, Christoph O.; Pratsinis, Sotiris E., E-mail: sotiris.pratsinis@ptl.mavt.ethz.ch

    2016-05-15

    Highlights: • Flame-made nanosilver dynamics are elucidated in the gas-phase & on substrates. • The resistance of freshly depositing nanosilver layers is monitored. • Low T{sub g} polymers facilitate rapid synthesis of conductive films. • Conductive nanosilver films form on top of or within the polymer depending on MW. - Abstract: Flexible and electrically conductive nanocomposite films are essential for small, portable and even implantable electronic devices. Typically, such film synthesis and conductivity measurement are carried out sequentially. As a result, optimization of filler loading and size/morphology characteristics with respect to film conductivity is rather tedious and costly. Here, freshly-made Ag nanoparticles (nanosilver) are made by scalable flame aerosol technology and directly deposited onto polymeric (polystyrene and poly(methyl methacrylate)) films during which the resistance of the resulting nanocomposite is measured in situ. The formation and gas-phase growth of such flame-made nanosilver, just before incorporation onto the polymer film, is measured by thermophoretic sampling and microscopy. Monitoring the nanocomposite resistance in situ reveals the onset of conductive network formation by the deposited nanosilver growth and sinternecking. The in situ measurement is much faster and more accurate than conventional ex situ four-point resistance measurements since an electrically percolating network is detected upon its formation by the in situ technique. Nevertheless, general resistance trends with respect to filler loading and host polymer composition are consistent for both in situ and ex situ measurements. The time lag for the onset of a conductive network (i.e., percolation) depends linearly on the glass transition temperature (T{sub g}) of the host polymer. This is attributed to the increased nanoparticle-polymer interaction with decreasing T{sub g}. Proper selection of the host polymer in combination with in situ resistance

  19. Fundamental Mechanisms of Roughening and Smoothing During Thin Film Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Headrick, Randall [Univ. of Vermont, Burlington, VT (United States)

    2016-03-18

    In this research program, we have explored the fundamental limits for thin film deposition in both crystalline and amorphous (i.e. non-crystalline) materials systems. For vacuum-based physical deposition processes such as sputter deposition, the background gas pressure of the inert gas (usually argon) used as the process gas has been found to be a key variable. Both a roughness transition and stress transition as a function of pressure have been linked to a common mechanism involving collisions of energetic particles from the deposition source with the process inert gas. As energetic particles collide with gas molecules in the deposition process they lose their energy rapidly if the pressure (and background gas density) is above a critical value. Both roughness and stress limit important properties of thin films for applications. In the area of epitaxial growth we have also discovered a related effect; there is a critical pressure below which highly crystalline layers grow in a layer-by-layer mode. This effect is also though to be due to energetic particle thermalization and scattering. Several other important effects such as the observation of coalescence dominated growth has been observed. This mode can be likened to the behavior of two-dimensional water droplets on the hood of a car during a rain storm; as the droplets grow and touch each other they tend to coalesce rapidly into new larger circular puddles, and this process proceeds exponentially as larger puddles overtake smaller ones and also merge with other large puddles. This discovery will enable more accurate simulations and modeling of epitaxial growth processes. We have also observed that epitaxial films undergo a roughening transition as a function of thickness, which is attributed to strain induced by the crystalline lattice mismatch with the substrate crystal. In addition, we have studied another physical deposition process called pulsed laser deposition. It differs from sputter deposition due to the

  20. Structure and Morphology of Phthalocyanine Films Grown in Electrical Fields by Vapor Deposition

    Science.gov (United States)

    Zhu, Shen; Banks, C. E.; Frazier, D. O.; Penn, B.; Abdeldayem, H.; Hicks, R.; Burns, H. D.; Thompson, G. W.

    1999-01-01

    Phthalocyanine (Pc) films have been synthesized by vapor deposition on quartz substrates, some of which were coated with a very thin gold film before depositing Pc films. Electrical fields up to 6200 V/cm between a mech electrode and the substrate are introduced during film growth. These films have been characterized by x-ray diffraction and scanning electron microscopy. The molecular orientations and surface morphology of Pc films were changed under the electrical fields. The surface of these films grown without electrical field shows whisk-like morphology. When films are deposited under an electrical field, a dense film with flat surface is obtained.

  1. Chemical Vapor Deposition of Aluminum Oxide Thin Films

    Science.gov (United States)

    Vohs, Jason K.; Bentz, Amy; Eleamos, Krystal; Poole, John; Fahlman, Bradley D.

    2010-01-01

    Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for many undergraduate chemistry laboratories, especially at smaller institutions. In an effort to…

  2. Protection of elastomers with DLC film : deposition, characterization and performance

    NARCIS (Netherlands)

    Martinez Martinez, Diego

    2017-01-01

    Elastomers are materials which suffer from strong wear and cause high friction losses when subjected to dynamic contact, leading quite often to failure of the components in devices. In this Thesis, the protection of elastomers by the deposition of carbon-based films (DLC) is studied. To accomplish t

  3. Flame spray pyrolysis synthesis and aerosol deposition of nanoparticle films

    DEFF Research Database (Denmark)

    Tricoli, Antonio; Elmøe, Tobias Dokkedal

    2012-01-01

    The assembly of nanoparticle films by flame spray pyrolysis (FSP) synthesis and deposition on temperature‐controlled substrates (323–723 K) was investigated for several application‐relevant conditions. An exemplary SnO2 nanoparticle aerosol was generated by FSP and its properties (e.g., particle...

  4. YBCO thin film evaporation on as-deposited silver film on MgO

    Science.gov (United States)

    Azoulay, J.

    1999-11-01

    YBa 2Cu 3O 7- δ (YBCO) thin film was evaporated on as-deposited Ag buffer layer on MgO substrate. A simple, inexpensive vacuum system equipped with one resistively heated source was used. The subsequent heat treatment was carried out under low oxygen partial pressure at a relatively low temperature and short dwelling time. The films thus obtained were characterized for electrical properties using DC four-probe electrical measurements and inspected for structural properties and chemical composition by scanning electron microscopy (SEM). It is shown that YBCO thin film can grow on as-deposited thin silver layer on MgO substrate.

  5. Silicon Nitride Film Deposition by Photochemical Vapor Deposition Using an Argon Excimer Lamp

    Science.gov (United States)

    Maezono, Yoshinari; Toshikawa, Kiyohiko; Kurosawa, Kou; Amari, Kouichi; Ishimura, Sou; Katto, Masahito; Yokotani, Atsushi

    2007-06-01

    In this paper, we report the deposition of silicon nitride (SiNx) films for the production of semiconductor devices and flat panel displays, by chemical vapor deposition with vacuum ultraviolet excimer lamps (VUV-CVD) using SiH4 and NH3 as raw materials. An Ar2* excimer lamp (λ=126 nm, hν=9.8 eV) with a high photon energy was used to directly excite and dissociate SiH4 through a photochemical reaction. SiNx films were successfully formed at a low temperature of 100 °C with the Ar2* excimer lamp. Although the Si-rich films were obtained using an Ar2* lamp, they showed a quality almost similar to that of films obtained by conventional plasma-CVD at 400 °C.

  6. Low resistance polycrystalline diamond thin films deposited by hot filament chemical vapour deposition

    Indian Academy of Sciences (India)

    Mahtab Ullah; Ejaz Ahmed; Abdelbary Elhissi; Waqar Ahmed

    2014-05-01

    Polycrystalline diamond thin films with outgrowing diamond (OGD) grains were deposited onto silicon wafers using a hydrocarbon gas (CH4) highly diluted with H2 at low pressure in a hot filament chemical vapour deposition (HFCVD) reactor with a range of gas flow rates. X-ray diffraction (XRD) and SEM showed polycrystalline diamond structure with a random orientation. Polycrystalline diamond films with various textures were grown and (111) facets were dominant with sharp grain boundaries. Outgrowth was observed in flowerish character at high gas flow rates. Isolated single crystals with little openings appeared at various stages at low gas flow rates. Thus, changing gas flow rates had a beneficial influence on the grain size, growth rate and electrical resistivity. CVD diamond films gave an excellent performance for medium film thickness with relatively low electrical resistivity and making them potentially useful in many industrial applications.

  7. Closely packed Ge quantum dots in ITO matrix: influence of Ge crystallization on optical and electrical properties

    Science.gov (United States)

    Car, Tihomir; Nekić, Nikolina; Jerčinović, Marko; Salamon, Krešimir; Bogdanović-Radović, Iva; Delač Marion, Ida; Dasović, Jasna; Dražić, Goran; Ivanda, Mile; Bernstorff, Sigrid; Pivac, Branko; Kralj, Marko; Radić, Nikola; Buljan, Maja

    2016-06-01

    In the present work, a method for the low-temperature production of the material consisting of closely packed Ge QDs embedded in ITO matrix is described. The films are produced by magnetron sputtering deposition followed by thermal annealing. It is shown that the conductivity and optical properties of the films depend on the structure, Ge content in the ITO matrix as well as on the annealing conditions. The conductivity of the films changes up to seven orders of magnitude in dependence on the annealing conditions, and it shows transformation from semiconductor to metallic behavior. The optical properties are also strongly affected by the preparation and annealing conditions, so both conductivity and optical properties can be controllably manipulated. In addition, the crystallization of Ge is found to occur already at 300 °C, which is significantly lower than the crystallization temperature of Ge produced by the same method in silica and alumina matrices.

  8. Pyrolytic carbon film deposit as an electrochemical interface.

    Directory of Open Access Journals (Sweden)

    M. Hadi

    2009-02-01

    Full Text Available A pyrolytic carbon (PC film was grown on planar substrate (graphite rods by chemical vapor deposition from gaseous feed of methane using a vertical hot-wall deposition reactor. Scanning electron microscopy was used to study the surface structure. The PC film was also characterized by cyclic voltammetry technique to evaluate the background current, stability and the electrochemical response using ascorbic acid, Co(phen32+/3+ and Fe(CN6 3-/4- redox couplesand compared to glassy carbon (GC electrode. High degree of electrochemical activity and the enhanced signal to background (S/B ratio demonstrated that the PC film might be an attractive electrode material for electroanalytical measurements.

  9. Optical and electrochemical evaluation of colloidal Au nanoparticle-ITO hybrid optically transparent electrodes and their application to attenuated total reflectance spectroelectrochemistry

    Energy Technology Data Exchange (ETDEWEB)

    Richardson, John N.; Aguilar, Zoraida; Kaval, Necati; Andria, Sara E.; Shtoyko, Tanya; Seliskar, Carl J.; Heineman, William R

    2003-12-15

    Colloidal Au nanoparticle monolayers covalently deposited on conductive layers of indium tin oxide (ITO) were fabricated and evaluated as optically transparent electrodes (OTEs) for spectroelectrochemical applications. Specifically, the electrodes were characterized using UV-Vis spectroscopy and cyclic voltammetry; comparisons are made with other types of hybrid ITO optically transparent electrodes. The optical modulation of surface-bound colloidal Au in response to potential cycling over a wide potential window (0.6 to -1.0 V) was acquired in an attenuated total reflectance (ATR) spectroelectrochemical cell. Finally, uptake of a model analyte, tris-(2,2'-bipyridyl)ruthenium(II) chloride, into a Nafion charge selective film spin coated onto the colloidal Au-ITO hybrid electrode was examined using ATR absorbance spectroelectrochemistry. Dependence of uptake on film thickness is addressed, and non-optimized detection limits of 10 nM are reported.

  10. Directed vapor deposition of lithium manganese oxide films

    Science.gov (United States)

    Jin, Sang-Wan

    Electron beam evaporation and sputtering techniques are used to fabricate multilayered thin film structures. However, these techniques suffer several drawbacks resulting from (i) the complex chemistries of the lithiated oxide layers used for the cathode and electrolyte, (ii) the need for precise microstructure control in systems with many metastable phases, and (iii) the low deposition rate and poor material utilization efficiency, which slows the application of this energy storage approach. This dissertation has investigated the use of a novel electron-beam directed vapor deposition (EB-DVD) method for the synthesis of thin film batteries. The dissertation focuses upon the cathode layer of a representative Li-ion thin film battery system and investigates in detail the deposition of lithium manganese oxide films. Many phases with offering various electrochemical performance exist in the Li-Mn-O system and the thesis also investigates the use of processing conditions to control the structure and composition of these cathode layers. In the EB-DVD approach, a high voltage electron beam is used to evaporate a source material in the throat of a nozzle that forms a coaxial transonic gas jet around the vapor. The gas jet entrains and transports the vapor to a substrate where the deposition occurs. Directed simulation of Monte Carlo (DSMC) methods indicated that the vapor plume could be matched to a substrate diameter, and the deposition rate (and vapor utilization efficiency) therefore controlled by adjusting the pressure ratio up and downstream of the nozzle opening in the deposition chamber, and by varying the gas jet density and speed. The highest deposition rates were obtained with a high pressure ratio and the gas jet density. These observations are found to be consistent with the experimental results. Deposition rates up to 16 nm/s could be achieved using the most effective gas entrainment conditions identified by DSMC calculation. This was about a factor of ten

  11. Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Munoz-Martin, D.; Fernandez-Navarro, J.M. [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Gonzalo, J., E-mail: j.gonzalo@io.cfmac.csic.es [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Jose, G.; Jha, A. [Institute for Materials Research, University of Leeds, Clarendon Road, Leeds LS2 9JT (United Kingdom); Fierro, J.L.G. [Instituto de Catalisis y Petroleoquimica (CSIC), Marie Curie s/n, 28049 Cantoblanco (Spain); Domingo, C. [Instituto de Estructura de la Materia (CSIC), Serrano 121, 28006 Madrid (Spain); Garcia-Lopez, J. [Centro Nacional de Aceleradores, P. Tecnologico ' Cartuja 93' , 41092 Sevilla (Spain)

    2011-10-31

    Tellurite (TeO{sub 2}-TiO{sub 2}-Nb{sub 2}O{sub 5}) thin film glasses have been produced by pulsed laser deposition at room temperature at laser energy densities in the range of 0.8-1.5 J/cm{sup 2} and oxygen pressures in the range of 3-11 Pa. The oxygen concentration in the films increases with laser energy density to reach values very close to that of the bulk glass at 1.5 J/cm{sup 2}, while films prepared at 1.5 J/cm{sup 2} and pressures above 5 Pa show oxygen concentration in excess of 10% comparing to the glass. X-ray photoelectron spectroscopy shows the presence of elementary Te in films deposited at O{sub 2} pressures {<=} 5 Pa that is not detected at higher pressures, while analysis of Raman spectra of the samples suggests a progressive substitution of TeO{sub 3} trigonal pyramids by TeO{sub 4} trigonal bipyramids in the films when increasing their oxygen content. Spectroscopic ellipsometry analysis combined with Cauchy and effective medium modeling demonstrates the influence of these compositional and structural modifications on the optical response of the films. Since the oxygen content determines their optical response through the structural modifications induced in the films, those can be effectively controlled by tuning the deposition conditions, and films having large n (2.08) and reduced k (< 10{sup -4}) at 1.5 {mu}m have been produced using the optimum deposition conditions.

  12. Dual ion beam deposition of carbon films with diamondlike properties

    Science.gov (United States)

    Mirtich, M. J.; Swec, D. M.; Angus, J. C.

    1984-01-01

    A single and dual ion beam system was used to generate amorphous carbon films with diamond like properties. A methane/argon mixture at a molar ratio of 0.28 was ionized in the low pressure discharge chamber of a 30-cm-diameter ion source. A second ion source, 8 cm in diameter was used to direct a beam of 600 eV Argon ions on the substrates (fused silica or silicon) while the deposition from the 30-cm ion source was taking place. Nuclear reaction and combustion analysis indicate H/C ratios for the films to be 1.00. This high value of H/C, it is felt, allowed the films to have good transmittance. The films were impervious to reagents which dissolve graphitic and polymeric carbon structures. Although the measured density of the films was approximately 1.8 gm/cu cm, a value lower than diamond, the films exhibited other properties that were relatively close to diamond. These films were compared with diamondlike films generated by sputtering a graphite target.

  13. Pulsed laser deposition of nano-glassy carbon films

    Energy Technology Data Exchange (ETDEWEB)

    Ossi, P.M. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy)]. E-mail: paolo.ossi@polimi.it; Bottani, C.E. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy); Miotello, A. [Dip. Fisica, Universita di Trento, 38050 Povo (TN) (Italy)

    2005-07-30

    Carbon films have been deposited at room temperature on (1 0 0) Si substrates by pulsed laser ablation (PLA) from a highly oriented pyrolitic graphite source. Changing the laser power density from 8.5 to 19 MW mm{sup -2} and using various ambient atmospheres (helium, argon from 0.6 Pa to 2 kPa), nano-sized cluster-assembled films were obtained. Scanning electron microscopy shows that the film morphology, changes with increasing ambient gas pressure. We observed in the sequence: dense columns, node-like morphology, platelets (only in argon) and an open dendritic structure. By atomic force microscopy, on representative films, we evaluated the size distribution and relative abundancy of aggregates of carbon clusters, as well as film roughness. Raman spectroscopy shows that all the films are sp{sup 2} coordinated, structurally disordered and belong to the family of carbon nano-glasses. The estimated film coherence length gives an average size of about 5 nm for the agglomerated carbon clusters in the films. The average number of carbon atoms per cluster depends on ambient gas pressure, but is nearly independent of laser intensity.

  14. Effective conductivity of chemically deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Robles, M. [Universidad Autonoma del Estado de Morelos (UAEM), Cuernavaca (Mexico). Fac. de Ciencias; Tagueena-Martinez, J. [IIM-UNAM, Temixco, Morelos (Mexico). Lab. de Energia Solar; Del Rio, J.A. [IIM-UNAM, Temixco, Morelos (Mexico). Lab. de Energia Solar

    1997-01-30

    Chemically deposited thin films have multiple applications. However, as a result of their complex structure, their physical properties are very difficult to predict. In this paper, we use an effective medium approach to model these heterogeneous systems. We extend Thorpe`s formula for the effective electrical conductivity of elliptical holes randomly distributed in a matrix to a system composed of conducting ellipses in a conducting matrix. This extension is used to calculate the effective electrical conductivity of polycrystalline chemically deposited ZnO thin films. We compare experimental results obtained by two different deposition methods: spray pyrolysis and successive ion layer adsorption and reaction (SILAR) reported here. We select the elliptical geometric parameters from microstructural data. Good agreement between the experimental measurements and our calculation is obtained. In addition, we present a new proof of the reciprocity theorem used to derive the theoretical relation. (orig.)

  15. Deposition of thermal and hot-wire chemical vapor deposition copper thin films on patterned substrates.

    Science.gov (United States)

    Papadimitropoulos, G; Davazoglou, D

    2011-09-01

    In this work we study the hot-wire chemical vapor deposition (HWCVD) of copper films on blanket and patterned substrates at high filament temperatures. A vertical chemical vapor deposition reactor was used in which the chemical reactions were assisted by a tungsten filament heated at 650 degrees C. Hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (CupraSelect) vapors were used, directly injected into the reactor with the aid of a liquid injection system using N2 as carrier gas. Copper thin films grown also by thermal and hot-wire CVD. The substrates used were oxidized silicon wafers on which trenches with dimensions of the order of 500 nm were formed and subsequently covered with LPCVD W. HWCVD copper thin films grown at filament temperature of 650 degrees C showed higher growth rates compared to the thermally ones. They also exhibited higher resistivities than thermal and HWCVD films grown at lower filament temperatures. Thermally grown Cu films have very uniform deposition leading to full coverage of the patterned substrates while the HWCVD films exhibited a tendency to vertical growth, thereby creating gaps and incomplete step coverage.

  16. Photocatalytic ability of TiO2 porous film prepared by modified spray pyrolysis deposition technique

    National Research Council Canada - National Science Library

    SUGIYAMA, Osamu; OKUYA, Masayuki; KANEKO, Shoji

    2009-01-01

    In a spray pyrolysis deposition (SPD) technique, deposition of film material and formation of surface structure are simultaneously occur, therefore, it is suitable for the preparation of microstructure-controlled thin films...

  17. Annealing dependence of residual stress and optical properties of TiO2 thin film deposited by different deposition methods.

    Science.gov (United States)

    Chen, Hsi-Chao; Lee, Kuan-Shiang; Lee, Cheng-Chung

    2008-05-01

    Titanium oxide (TiO(2)) thin films were prepared by different deposition methods. The methods were E-gun evaporation with ion-assisted deposition (IAD), radio-frequency (RF) ion-beam sputtering, and direct current (DC) magnetron sputtering. Residual stress was released after annealing the films deposited by RF ion-beam or DC magnetron sputtering but not evaporation, and the extinction coefficient varied significantly. The surface roughness of the evaporated films exceeded that of both sputtered films. At the annealing temperature of 300 degrees C, anatase crystallization occurred in evaporated film but not in the RF ion-beam or DC magnetron-sputtered films. TiO(2) films deposited by sputtering were generally more stable during annealing than those deposited by evaporation.

  18. Vacuum deposition onto webs, films and foils

    CERN Document Server

    Bishop, Charles A

    2011-01-01

    Roll-to-roll vacuum deposition is the technology that applies an even coating to a flexible material that can be held on a roll and provides a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces, such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging (e.g. snack packets). Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology: solar energy products are moving from rigid panels onto flexible substrates, which are cheaper and more versatile; in a similar way, electronic circuit 'boards' can be produced on a flexible polymer, creating a new range of 'flexible electronics' products; and, flexible displays are another area of new technology in vacuum coating, with flexible display panels and light sources emerging. Charles Bishop has written this book to meet the need he identified, as a t...

  19. Fabrication and characterization of a CuO/ITO heterojunction with a graphene transparent electrode

    Science.gov (United States)

    Mageshwari, K.; Han, Sanghoo; Park, Jinsub

    2016-05-01

    In this paper, we investigate the electrical properties of a CuO-ITO heterojunction diode with the use of a graphene transparent electrode by current-voltage (I-V) characteristics. CuO thin films were deposited onto an ITO substrate by a simple sol-gel spin coating method and annealed at 500 °C. The x-ray diffraction pattern of the CuO thin films revealed the polycrystalline nature of CuO and exhibited a monoclinic crystal structure. FESEM images showed a uniform and densely packed particulate morphology. The optical band gap of CuO thin films estimated using UV-vis absorption spectra was found to be 2.50 eV. The I-V characteristics of the fabricated CuO-ITO heterojunction showed a well-defined rectifying behavior with improved electrical properties after the insertion of graphene. The electronic parameters of the heterostructure such as barrier height, ideality factor and series resistance were determined from the I-V measurements, and the possible current transport mechanism was discussed.

  20. Enhanced Bactericidal Activity of Silver Thin Films Deposited via Aerosol-Assisted Chemical Vapor Deposition

    OpenAIRE

    Ponja, S. D.; Sehmi, S. K.; Allan, E.; MacRobert, A. J.; Parkin, I. P.; Carmalt, C. J.

    2015-01-01

    Silver thin films were deposited on SiO2-barrier-coated float glass, fluorine-doped tin oxide (FTO) glass, Activ glass, and TiO2-coated float glass via AACVD using silver nitrate at 350 °C. The films were annealed at 600 °C and analyzed by X-ray powder diffraction, X-ray photoelectron spectroscopy, UV/vis/near-IR spectroscopy, and scanning electron microscopy. All the films were crystalline, and the silver was present in its elemental form and of nanometer dimension. The antibacterial activit...

  1. High conductivity transparent carbon nanotube films deposited from superacid

    Energy Technology Data Exchange (ETDEWEB)

    Hecht, David S; Lee, Roland; Hu Liangbing [Unidym Incorporated, 1244 Reamwood Drive, Sunnyvale, CA 94089 (United States); Heintz, Amy M; Moore, Bryon; Cucksey, Chad; Risser, Steven, E-mail: dhecht@gmail.com [Battelle, 505 King Avenue, Columbus, OH 43201 (United States)

    2011-02-18

    Carbon nanotubes (CNTs) were deposited from a chlorosulfonic superacid solution onto PET substrates by a filtration/transfer method. The sheet resistance and transmission (at 550 nm) of the films were 60 {Omega}/sq and 90.9% respectively, which corresponds to a DC conductivity of 12 825 S cm{sup -1} and a DC/optical conductivity ratio of 64.1. This is the highest DC conductivity reported for CNT thin films to date, and attributed to both the high quality of the CNT material and the exfoliation/doping by the superacid. This work demonstrates that CNT transparent films have not reached the conductivity limit; continued improvements will enable these films to be used as the transparent electrode for applications in solid state lighting, LCD displays, touch panels, and photovoltaics.

  2. High conductivity transparent carbon nanotube films deposited from superacid.

    Science.gov (United States)

    Hecht, David S; Heintz, Amy M; Lee, Roland; Hu, Liangbing; Moore, Bryon; Cucksey, Chad; Risser, Steven

    2011-02-18

    Carbon nanotubes (CNTs) were deposited from a chlorosulfonic superacid solution onto PET substrates by a filtration/transfer method. The sheet resistance and transmission (at 550 nm) of the films were 60 Ω/sq and 90.9% respectively, which corresponds to a DC conductivity of 12,825 S cm(-1) and a DC/optical conductivity ratio of 64.1. This is the highest DC conductivity reported for CNT thin films to date, and attributed to both the high quality of the CNT material and the exfoliation/doping by the superacid. This work demonstrates that CNT transparent films have not reached the conductivity limit; continued improvements will enable these films to be used as the transparent electrode for applications in solid state lighting, LCD displays, touch panels, and photovoltaics.

  3. Reactive sputtering deposition of SiO2 thin films

    Directory of Open Access Journals (Sweden)

    IVAN RADOVIC

    2008-01-01

    Full Text Available SiO2 layers were deposited in a UHV chamber by 1 keV Ar+ ion sputtering from a high purity silicon target, using different values of the oxygen partial pressure (5×10-6–2×10-4 mbar and of the ion beam current on the target (1.67–6.85 mA. The argon partial pressure during operation of the ion gun was 1×10-3 mbar. The substrate temperature was held at 550 °C and the films were deposited to a thickness of 12.5–150 nm, at a rate from 0.0018–0.035 nm s-1. Structural characterization of the deposited thin films was performed by Rutherford backscattering spectrometry (RBS analysis. Reactive sputtering was proved to be efficient for the deposition of silica at 550 °C, an oxygen partial pressure of 2×10-4 mbar (ion beam current on the target of 5 mA or, at a lower deposition rate, ion beam current of 1.67 mA and an oxygen partial pressure of 6×10-5 mbar. One aspect of these investigations was to study the consumption of oxygen from the gas cylinder, which was found to be lower for higher deposition rates.

  4. RF sputtering deposited a-IGZO films for LCD alignment layer application

    Energy Technology Data Exchange (ETDEWEB)

    Wu, G.M., E-mail: wu@mail.cgu.edu.tw; Liu, C.Y.; Sahoo, A.K.

    2015-11-01

    Highlights: • a-IGZO nanolayer has been presented for alignment of liquid crystals in LCD. • RF sputtering deposition at an oblique angle has been performed to grow the films. • High transparency over 90% was obtained in the visible wavelength range. • The OCB cells exhibited fast on-off and short response time of 5.04 ms. • V–T characteristics proved high contrast ratio for LCD display applications. - Abstract: In this paper, amorphous indium gallium zinc oxide (a-IGZO) inorganic films were deposited at a fixed oblique angle using radio-frequency sputtering on indium tin oxide (ITO) glass as alternative alignment layer for liquid crystal displays. A series of experiments have been carried out to reveal the physical characteristics of the a-IGZO films, such as optical transmittance, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The special treatment a-IGZO films were used to fabricate liquid crystal (LC) cells and investigate the performances of these cells. Pretilt angles were measured with anti-parallel LC cells and voltage–transmittance (V–T) curve, contrast ratio, and response time were evaluated with optically compensated bend (OCB) LC cells. The electro-optical characteristics of the aligned homogenous LCs, and OCB mode cells based on the a-IGZO alignment layer were compared to those based on rubbing processed polyimide (PI). The results showed that the average transmittance in the visible wavelength range was higher than 90% for the a-IGZO alignment layer. The LC pretilt angle has been determined at about 6°. The evaluted cell critical voltage at maximum transmittance was 1.8 V, lower than the control cell using PI alignment layer. The OCB cell rise time and fall time were 1.55 ms and 3.49 ms, respectivly. A very quick response time of 5.04 ms has thus been achived. In addition, the study of V–T characteristics suggested higher contrast ratio for LCD display applications.

  5. Performance enhancement of ITO/oxide/semiconductor MOS-structure silicon solar cells with voltage biasing.

    Science.gov (United States)

    Ho, Wen-Jeng; Huang, Min-Chun; Lee, Yi-Yu; Hou, Zhong-Fu; Liao, Changn-Jyun

    2014-01-01

    In this study, we demonstrate the photovoltaic performance enhancement of a p-n junction silicon solar cell using a transparent-antireflective ITO/oxide film deposited on the spacing of the front-side finger electrodes and with a DC voltage applied on the ITO-electrode. The depletion width of the p-n junction under the ITO-electrode was induced and extended while the absorbed volume and built-in electric field were also increased when the biasing voltage was increased. The photocurrent and conversion efficiency were increased because more photo-carriers are generated in a larger absorbed volume and because the carriers transported and collected more effectively due to higher biasing voltage effects. Compared to a reference solar cell (which was biased at 0 V), a conversion efficiency enhancement of 26.57% (from 12.42% to 15.72%) and short-circuit current density enhancement of 42.43% (from 29.51 to 42.03 mA/cm(2)) were obtained as the proposed MOS-structure solar cell biased at 2.5 V. In addition, the capacitance-volt (C-V) measurement was also used to examine the mechanism of photovoltaic performance enhancement due to the depletion width being enlarged by applying a DC voltage on an ITO-electrode.

  6. Thin film deposition using rarefied gas jet

    Science.gov (United States)

    Pradhan, Sahadev, , Dr.

    2017-01-01

    The rarefied gas jet of aluminium is studied at Mach number Ma =(U_j /√{ kbTj / m }) in the range .01 mass and diameter, and kb is the Boltzmann constant. An important finding is that the capture width (cross-section of the gas jet deposited on the substrate) is symmetric around the centerline of the substrate, and decreases with increased Mach number due to an increase in the momentum of the gas molecules. DSMC simulation results reveals that at low Knudsen number ((Kn =0.01); shorter mean free paths), the atoms experience more collisions, which direct them toward the substrate. However, the atoms also move with lower momentum at low Mach number ,which allows scattering collisions to rapidly direct the atoms to the substrate.

  7. Electrolytically deposited Cadmium Selenide Films for Photovoltaic Applications

    Directory of Open Access Journals (Sweden)

    Palaiologopoulou M. D.

    2012-10-01

    Full Text Available CdSe films were electrodeposited on pure nickel substrates. The nickel substrate was polished to a mirror finish by Al2O3 paste, etched in 10% HCl solution for 40 s and rinsed thoroughly by de-ionized water. The deposition bath contained solutions with excessive Cd2+ (0.2M from CdSO4 and small amounts of SeO2 (1x10-3 M. The pH of the bath was adjusted to a value of 2.2 at RT by adding 10% H2SO4. The bath was first thermostated at the required temperature, which varied from 55°C to 65°C. Plating was accomplished at deposition potential 1000 mV (vs. Hg/Hg2SO4. The films formed had a uniform thickness and it was found to be approximately 2.0 μm thick (for 20 min electrodeposition process. The produced CdSe films were characterized by X-Ray diffraction and SEM. The induced semiconductor doping effect by thermal annealing in pure dry nitrogen gas was also investigated. Gold contacts were placed on top of the CdSe films, either by evaporation, or mechanically. Depending on the deposition parameters the electrical characteristics of the Ni/CdSe/Au structures may exhibit rectification properties. The optical excitation of the structure was investigated for various CdSe thicknesses.

  8. Chemical bath deposition and characterization of Cu2O-CuxS thin films

    OpenAIRE

    EYA, D. D. O.

    2010-01-01

    Cu2O-CuxS thin films have been deposited on glass substrate by chemical bath deposition technique. The films were obtained by depositing Copper Sulphide (CuxS) on Copper (I) Oxide (Cu2O) and then Cu2O on CuxS. The peak solar transmittance across the thin films were found to be

  9. Production of selective membranes using plasma deposited nanochanneled thin films

    Directory of Open Access Journals (Sweden)

    Rodrigo Amorim Motta Carvalho

    2006-12-01

    Full Text Available The hydrolization of thin films obtained by tetraethoxysilane plasma polymerization results in the formation of a nanochanneled silicone like structure that could be useful for the production of selective membranes. Therefore, the aim of this work is to test the permeation properties of hydrolyzed thin films. The films were tested for: 1 permeation of polar organic compounds and/or water in gaseous phase and 2 permeation of salt in liquid phase. The efficiency of permeation was tested using a quartz crystal microbalance (QCM technique in gas phase and conductimetric analysis (CA in liquid phase. The substrates used were: silicon for characterization of the deposited films, piezoelectric quartz crystals for tests of selective membranes and cellophane paper for tests of permeation. QCM analysis showed that the nanochannels allow the adsorption and/or permeation of polar organic compounds, such as acetone and 2-propanol, and water. CA showed that the films allow salt permeation after an inhibition time needed for hydrolysis of the organic radicals within the film. Due to their characteristics, the films can be used for grains protection against microorganism proliferation during storage without preventing germination.

  10. Optical properties of nanocrystallite films of α-Fe2O3 and α-Fe2-x Cr x O3 (0.0  ⩽  x  ⩽  0.9) deposited on glass substrates

    Science.gov (United States)

    Kumar, Ajay; Yadav, Kamlesh

    2017-07-01

    α-Fe2O3 films are deposited on fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO) substrates for 1, 4 and 6 min using a spray pyrolysis technique. We also deposited α-Fe2-x Cr x O3 (x  =  0.0, 0.1, 0.2, 0.3, 0.4, 0.7 and 0.9) films on the FTO substrate for a deposition time of 35 s. The structural and optical properties of these films were then studied. The x-ray diffraction (XRD) patterns show that all the films are crystalline in nature with a hexagonal crystal structure. The average grain size and unit cell volume were calculated using XRD data. It is found that the average grain size and unit cell volume increase with an increasing film thickness and Cr-doping concentration. The value of strain decreases with an increasing film thickness and Cr-doping content. It is also found that films with the same deposition time on the ITO substrate are more crystalline than on the FTO substrate. Furthermore, the average grain size is obtained from field emission scanning electron microscopy (FESEM) images. FESEM analysis confirms that the average grain size increases with the film thickness and Cr-doping concentration. The optical absorption spectra of the films show that the absorbance increases with an increasing deposition time and Cr concentration. The energy band gap (E g) of all the films has been calculated using Tauc’s relation. A narrowing of the band gap was observed with an increase in film thickness and Cr-doping content. The reduction of the band gap with the increase in film thickness of the films deposited on the ITO substrate is larger than for the film deposited on the FTO substrate. The refractive index is also obtained from the absorption spectra of the films using the Moss relation: n  =  \\sqrt[4]{≤ft(k/{{E}\\text{g}}\\right)} , where k  =108 eV. The refractive index decreases with an increase in the optical band gap. The band gaps of the films are also calculated from the FTIR spectra. This is in good

  11. Growth and microstructure properties of microcrystalline silicon films deposited using jet-ICPCVD

    Institute of Scientific and Technical Information of China (English)

    Zuo Zewen; Guan Wentian; Xin Yu; Lü Jin; Wang Junzhuan; Pu Lin; Shi Yi; Zheng Youdou

    2011-01-01

    Microcrystalline silicon films were deposited at a high rate and low temperature using jet-type inductively coupled plasma chemical vapor deposition (jet-ICPCVD).An investigation into the deposition rate and microstructure properties of the deposited films showed that a high deposition rate of over 20 nm/s can be achieved while maintaining reasonable material quality.The deposition rate can be controlled by regulating the generation rate and transport of film growth precursors.The film with high crystallinity deposited at low temperature could principally result from hydrogen-induced chemical annealing.

  12. Polymer-assisted deposition of metal-oxide films.

    Science.gov (United States)

    Jia, Q X; McCleskey, T M; Burrell, A K; Lin, Y; Collis, G E; Wang, H; Li, A D Q; Foltyn, S R

    2004-08-01

    Metal oxides are emerging as important materials for their versatile properties such as high-temperature superconductivity, ferroelectricity, ferromagnetism, piezoelectricity and semiconductivity. Metal-oxide films are conventionally grown by physical and chemical vapour deposition. However, the high cost of necessary equipment and restriction of coatings on a relatively small area have limited their potential applications. Chemical-solution depositions such as sol-gel are more cost-effective, but many metal oxides cannot be deposited and the control of stoichiometry is not always possible owing to differences in chemical reactivity among the metals. Here we report a novel process to grow metal-oxide films in large areas at low cost using polymer-assisted deposition (PAD), where the polymer controls the viscosity and binds metal ions, resulting in a homogeneous distribution of metal precursors in the solution and the formation of uniform metal-organic films. The latter feature makes it possible to grow simple and complex crack-free epitaxial metal-oxides.

  13. Oxidative chemical vapor deposition of polyaniline thin films.

    Science.gov (United States)

    Smolin, Yuriy Y; Soroush, Masoud; Lau, Kenneth K S

    2017-01-01

    Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI.

  14. Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films

    Science.gov (United States)

    Anna M. Clausen; Deborah M. Paskiewicz; Alireza Sadeghirad; Joseph Jakes; Donald E. Savage; Donald S. Stone; Feng Liu; Max G. Lagally

    2014-01-01

    Thin-film deposition on ultra-thin substrates poses unique challenges because of the potential for a dynamic response to the film stress during deposition. While theoretical studies have investigated film stress related changes in bulk substrates, little has been done to learn how stress might evolve in a film growing on a compliant substrate. We use silicon...

  15. Liposomes as drug deposits in multilayered polymer films.

    Science.gov (United States)

    Lynge, Martin E; Laursen, Marie Baekgaard; Hosta-Rigau, Leticia; Jensen, Bettina E B; Ogaki, Ryosuke; Smith, Anton A A; Zelikin, Alexander N; Städler, Brigitte

    2013-04-24

    The ex vivo growth of implantable hepatic or cardiac tissue remains a challenge and novel approaches are highly sought after. We report an approach to use liposomes embedded within multilayered films as drug deposits to deliver active cargo to adherent cells. We verify and characterize the assembly of poly(l-lysine) (PLL)/alginate, PLL/poly(l-glutamic acid), PLL/poly(methacrylic acid) (PMA), and PLL/cholesterol-modified PMA (PMAc) films, and assess the myoblast and hepatocyte adhesion to these coatings using different numbers of polyelectrolyte layers. The assembly of liposome-containing multilayered coatings is monitored by QCM-D, and the films are visualized using microscopy. The myoblast and hepatocyte adhesion to these films using PLL/PMAc or poly(styrenesulfonate) (PSS)/poly(allyl amine hydrochloride) (PAH) as capping layers is evaluated. Finally, the uptake of fluorescent lipids from the surface by these cells is demonstrated and compared. The activity of this liposome-containing coating is confirmed for both cell lines by trapping the small cytotoxic compound thiocoraline within the liposomes. It is shown that the biological response depends on the number of capping layers, and is different for the two cell lines when the compound is delivered from the surface, while it is similar when administered from solution. Taken together, we demonstrate the potential of liposomes as drug deposits in multilayered films for surface-mediated drug delivery.

  16. Poly-para-xylylene thin films: A study of the deposition chemistry, kinetics, film properties, and film stability

    Science.gov (United States)

    Fortin, Jeffrey Bernard

    Poly-para-xylylene, or parylene, thin films are chemically vapor deposited (CVD), conformal, pin-hole free polymeric thin films. They have found many industrial uses since there invention in 1947 and continue to find new applications in micro-electronics, biotechnology, and micro-electro-mechanical systems. In this study the deposition chemistry, deposition kinetics, film properties, and film stability were investigated. A differentially pumped quadrupole mass spectrometer was used to analyze the vapor species present during the CVD process. The identity of dimer contamination and its impact on the CVD process and film properties was studied. The quantitative conversion of dimer to monomer was investigated and it was found that conversion begins at around 385°C and by 565°C 100% conversion is obtained. The kinetics of the CVD process was analyzed for a range of substrate temperatures and chamber pressures. A new kinetic model based on a two-step adsorption was developed and fit the kinetic data well. This model should be appropriate for use with all parylene family polymers. Many of the properties of the films deposited in this study were analyzed. This includes a detailed study of surface morphology using atomic force microscopy which shows the interface width increases as a power law of film thickness. Other properties analyzed were the thermal stability, electrical properties, index of refraction, birefringence, hardness, and elastic modulus. The effect of ultraviolet (UV) radiation of lambda ≥ 250 nm on the thermal stability, electrical, and optical properties of thin parylene films was studied. The thermal stability and electrical properties of UV treated films were seen to deteriorate as the radiation dose increased. The stability of parylene thin films receiving plasma etching was analyzed. The dielectric constant, dissipation factor, and leakage current of plasma etched thin parylene films were investigated and found to be stable for the range of

  17. Synthesis, deposition and characterization of ferroelectric films for electrooptic devices

    Science.gov (United States)

    Tunaboylu, Bahadir

    The use of integrable ferroelectric electro-optic thin films is a revolutionary approach in the development of high-speed, low-voltage and high-contrast ratio integrated electro-optic spatial light modulators (SLM) for free-space optoelectronic interconnects. Thin films offer improved performance over bulk ferroelectric (FE) materials because of their lower modulator capacitance and operation at high speeds with low switching energies. Integration of ferroelectric thin films with silicon technology will also impact both the uncooled infrared sensor and dynamic and nonvolatile memory technologies. Ferroelectrics such as lead lanthanum zirconate titanate (PLZT) and patassium tantalate niobate (KTN) present great potential for SLMs due to their large electro-optic (EO) effect in the bulk form. The development of thin-film SLMs require electro-optic films of high optical quality with good dielectric and EO properties. High quality thin films of PLZT and KTN were deposited using RF magnetron sputtering on r-plane sapphire substrates which offer integration capability with semiconductor devices. PLZT films with extremely large peak dielectric constant, 2800 at the Curie temperature of 180sp°C, were achieved with remarkably low dissipation loss factor dielectric frequency dispersion was determined to be very small up to 1 Mhz. Also, the absorption of the light in the films was very low. A giant effective quadratic electrooptic effect was demonstrated in PLZT films. These results represent a huge leap forward for the FE-SLM technology with respect to the goal of fully integrated thin film electrooptic light modulators. Microstructural development and phase transformation kinetics in PLZT films were also analyzed for the first time and are presented here. Energy required for the formation of desirable perovskite phase was determined to be 322 kJ/mol. Single-phase PLZT films with larger average grain size showed higher dielectric constants and better EO properties as

  18. Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hennessy, John, E-mail: john.j.hennessy@jpl.nasa.gov; Jewell, April D.; Balasubramanian, Kunjithapatham; Nikzad, Shouleh [Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, California 91109 (United States)

    2016-01-15

    Aluminum fluoride (AlF{sub 3}) is a low refractive index material with promising optical applications for ultraviolet (UV) wavelengths. An atomic layer deposition process using trimethylaluminum and anhydrous hydrogen fluoride has been developed for the deposition of AlF{sub 3} at substrate temperatures between 100 and 200 °C. This low temperature process has resulted in thin films with UV-optical properties that have been characterized by ellipsometric and reflection/transmission measurements at wavelengths down to 200 nm. The optical loss for 93 nm thick films deposited at 100 °C was measured to be less than 0.2% from visible wavelengths down to 200 nm, and additional microstructural characterization demonstrates that the films are amorphous with moderate tensile stress of 42–105 MPa as deposited on silicon substrates. X-ray photoelectron spectroscopy analysis shows no signature of residual aluminum oxide components making these films good candidates for a variety of applications at even shorter UV wavelengths.

  19. Deposition and consolidation of porous ceramic films for membrane separation

    DEFF Research Database (Denmark)

    Elmøe, Tobias Dokkedal; Tricoli, Antonio; Johannessen, Tue

    The deposition of porous ceramic films for membrane separation can be done by several processes such as thermophoresis [1], dip-coating [2] and spray pyrolysis [3]. Here we present a high-speed method, in which ceramic nano-particles form a porous film by filtration on top of a porous ceramic...... substrate [4]. Ceramic nano-particles are generated in a flame, using either a premixed (gas) flame, in which a metal-oxide precursor is evaporated in an N2 stream, which is combusted with methane and air, or using a flame spray pyrolysis, in which a liquid metal-oxide precursor is sprayed through a nozzle...

  20. Structural and Optical Properties of Chemical Bath Deposited Silver Oxide Thin Films: Role of Deposition Time

    Directory of Open Access Journals (Sweden)

    A. C. Nwanya

    2013-01-01

    Full Text Available Silver oxide thin films were deposited on glass substrates at a temperature of 50°C by chemical bath deposition technique under different deposition times using pure AgNO3 precursor and triethanolamine as the complexing agent. The chemical analysis based on EDX technique shows the presence of Ag and O at the appropriate energy levels. The morphological features obtained from SEM showed that the AgxO structures varied as the deposition time changes. The X-ray diffraction showed the peaks of Ag2O and AgO in the structure. The direct band gap and the refractive index increased as the deposition time increased and was in the range of 1.64–1.95 eV and 1.02–2.07, respectively. The values of the band gap and refractive index obtained indicate possible applications in photovoltaic and photothermal systems.

  1. Rapid Deposition of Titanium Oxide and Zinc Oxide Films by Solution Precursor Plasma Spray

    Science.gov (United States)

    Ando, Yasutaka

    In order to develop a high rate atmospheric film deposition process for functional films, as a basic study, deposition of titanium oxide film and zinc oxide film by solution precursor plasma spray (SPPS) was conducted in open air. Consequently, in the case of titanium oxide film deposition, anantase film and amorphous film as well as rutile film could be deposited by varying the deposition distance. In the case of anatase dominant film, photo-catalytic properties of the films could be confirmed by wettability test. In addition, the dye sensitized sollar cell (DSC) using the TiO2 film deposited by this SPPS technique as photo voltaic device generates 49mV in OCV. On the other hand, in the case of zinc oxide film deposition, it was proved that well crystallized ZnO films with photo catalytic properties could be deposited. From these results, this process was found to have high potential for high rate functional film deposition process conducted in the air.

  2. Electrophoretic deposition and constrained sintering of strontium titanate thick films

    Energy Technology Data Exchange (ETDEWEB)

    Amaral, Luís; Vilarinho, Paula M., E-mail: paula.vilarinho@ua.pt; Senos, Ana M.R.

    2015-01-15

    Thick films of functional oxides are currently substituting counterparts bulk ceramics, as in the case of low loss dielectrics. For SrTiO{sub 3} (ST) based compositions it is demonstrated that electrophoretic deposition (EPD), using acetone as a suspension media with iodine addition, is a suitable technology to fabricate 12 μm thick films. The microstructural analysis of the films sintered at 1500 °C shows that highly densified microstructures can be obtained and, by slightly varying the Sr/Ti stoichiometry in the powder composition, increased densification and grain size and enlargement of the distribution with decreasing Sr/Ti ratio can be observed. In spite of the high densification of the films, it is also demonstrated that due to the constraint imposed by the substrate a smaller grain size is observed in thick films as compared to equivalent bulk ceramics. In addition, a preferential vertical pore orientation is observed in ST thick films. These results may have broad implications if one considers that the dielectric losses and dielectric tunability is affected by pore orientation, since it affects the electric field distribution. - Highlights: • Nonstoichiometry effect on microstructure of constrained sintered thick films and bulk is similar. • Increased densification and grain size and enlargement of distribution with decreasing Sr/Ti ratio. • Independent of Sr/Ti ratio smaller grain size for thick films compared to ceramics. • Preferential vertical pore orientation for constrained sintering of thick films. • Anisotropic porosity as tailoring factor to engineer permittivity and tunability.

  3. Preparation of High Quality Indium Tin Oxide Film on a Microbial Cellulose Membrane Using Radio Frequency Magnetron Sputtering%采用磁控溅射法在细菌纤维素膜上制备高性能的铟锡氧化物薄膜

    Institute of Scientific and Technical Information of China (English)

    杨加志; 赵成刚; 刘晓丽; 于俊伟; 孙东平; 唐卫华

    2011-01-01

    Microbial cellulose (MC) membranes produced by Acetobacterxylinumn NUST4.1, were used as flexible substrates for the fabrication of transparent indium tin oxide (ITO) electrodes. Transparent and conductive ITO thin films were deposited on MC membrane at room temperature using radio frequency (RF) magnetron sputtering. The optimum ITO deposition conditions were achieved by examining crystalline structure, surface morphology and optoelectrical characteristics with X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and UV spectroscopy. The sheet resistance of the samples was measured with a four-point probe and the resistivity of the film was calculated. The results reveal that the preferred orientation of the deposited ITO crystals is strongly dependent upon with oxygen content (O2/Ar, volume ratio) in the sputtering chamber. And the ITO crystalline structure directly determines the conductivity of ITO-deposited films. High conductive [sheet resistance -120 Ω·square-1 (Ω·sq-1)] and transparent (above 76%) ITO thin films (240 nm thick) were obtained with a moderate sputtering power (about 60 W) and with an oxygen flow rate of 0.25 ml.min-1(sccm) during the deposition. These results show that the ITO-MC electrodes can find their potential application in optoelectrical devices.

  4. The structural characterisation of HWCVD-deposited nanocrystalline silicon films

    Directory of Open Access Journals (Sweden)

    Bibhu P. Swain

    2009-12-01

    Full Text Available Nanocrystalline silicon (nc-Si films were deposited by hot-wire chemical vapour deposition (HWCVD in the presence of varying H2 concentrations and their structural and interfacial character investigated by X-ray diffraction, small-angle X-ray scattering (SAXS and Raman spectroscopy. The crystalline fraction was around 30–50% and the nc-Si crystallite size was in the range 20–35 nm. The SAXS results were analysed by Guinier plot, scaling factor, and correlation distance. The nc-Si grains displayed a mass fractal appearance, and the interfacial inhomogeneity distance was ~2 nm.

  5. Growth Model for Pulsed-Laser Deposited Perovskite Oxide Films

    Institute of Scientific and Technical Information of China (English)

    WANG Xu; FEI Yi-Yan; ZHU Xiang-Dong; Lu Hui-Bin; YANG Guo-Zhen

    2008-01-01

    We present a multi-level growth model that yields some of the key features of perovskite oxide film growth as observed in the reflection high energy electron diffraction(RHEED)and ellipsometry studies.The model describes the effect of deposition,temperature,intra-layer transport,interlayer transport and Ostwald ripening on the morphology of a growth surface in terms of the distribution of terraces and step edges during and after deposition.The numerical results of the model coincide well with the experimental observation.

  6. High performance hydrogen sensor based on Mn implanted ZnO nanowires array fabricated on ITO substrate.

    Science.gov (United States)

    Renitta, A; Vijayalakshmi, K

    2017-08-01

    In the present research, we propose a novel approach for the detection of hydrogen gas using Mn implanted ZnO nanowires fabricated onto ITO coated glass substrate by chemical spray pyrolysis deposition. The effect of Mn concentration on the structural, optical and morphological properties of ZnO films were investigated. X-ray diffraction studies showed that the Mn implanted ZnO films were grown as a polycrystalline hexagonal wurtzite phase without any impurities. The (101) peak position of ZnO-Mn films was shifted towards a lower angle with increasing Mn concentration. The optical band gap decreased from 3.45eV to 3.23eV with increasing Mn content. PL spectra, revealed sharp and strong near band edge emission which suggests that ZnO nanowires exhibit high crystalline quality. FE-SEM images of Mn implanted ZnO show perfectly aligned nanowires for all the films fabricated on ITO. The material (Zn, O, Mn) was confirmed by EDX spectra. The hydrogen sensing mechanism of the Mn implanted ZnO nanowire sensor was also discussed. It was found that H2 response was significantly enhanced by more than one order of magnitude with increasing Mn doping concentrations. The studied ZnO-Mn films coated on ITO substrate can be used as a low cost and easy-fabrication hydrogen sensing material. Copyright © 2017 Elsevier B.V. All rights reserved.

  7. Very High Output Thermoelectric Devices Based on ITO Nanocomposites

    Science.gov (United States)

    Fralick, Gustave; Gregory, Otto J.

    2009-01-01

    A material having useful thermoelectric properties was synthesized by combining indium-tin-oxide (ITO) with a NiCoCrAlY alloy/alumina cermet. This material had a very large Seebeck coefficient with electromotive-force-versustemperature behavior that is considered to be excellent with respect to utility in thermocouples and other thermoelectric devices. When deposited in thin-film form, ceramic thermocouples offer advantages over precious-metal (based, variously, on platinum or rhodium) thermocouples that are typically used in gas turbines. Ceramic thermocouples exhibit high melting temperatures, chemical stability at high temperatures, and little or no electromigration. Oxide ceramics also resist oxidation better than metal thermocouples, cost substantially less than precious-metal thermocouples, and, unlike precious-metal thermocouples, do not exert catalytic effects.

  8. Nanoparticle formation and thin film deposition in aniline containing plasmas

    Science.gov (United States)

    Pattyn, Cedric; Dias, Ana; Hussain, Shahzad; Strunskus, Thomas; Stefanovic, Ilija; Boulmer-Leborgne, Chantal; Lecas, Thomas; Kovacevic, Eva; Berndt, Johannes

    2016-09-01

    This contribution deals with plasma based polymerization processes in mixtures of argon and aniline. The investigations are performed in a capacitively coupled RF discharge (in pulsed and continuous mode) and concern both the observed formation of nanoparticles in the plasma volume and the deposition of films. The latter process was used for the deposition of ultra-thin layers on different kind of nanocarbon materials (nanotubes and free standing graphene). The analysis of the plasma and the plasma chemistry (by means of mass spectroscopy and in-situ FTIR spectroscopy) is accompanied by several ex-situ diagnostics of the obtained materials which include NEXAFS and XPS measurements as well as Raman spectroscopy and electron microscopy. The decisive point of the investigations concern the preservation of the original monomer structure during the plasma polymerization processes and the stability of the thin films on the different substrates.

  9. Raman spectra of amorphous carbon films deposited by SWP

    Science.gov (United States)

    Xu, Junqi; Liu, Weiguo; Hang, Lingxia; Su, Junhong; Fan, Huiqing

    2010-10-01

    Amorphous carbon film is one of the most important anti-reflection protective films coated on infrared optical components. In this paper, hydrogen-free amorphous carbon films were deposited by new type surface-wave-sustained plasma (SWP) source with a graphite target at various experiment parameters. The laser Raman spectroscopy at wavelength of 514 nm was used to investigate the structure and bonding of these carbon films. The results showed consanguineous correlations between the intensity ratio ID/IG and the experiment parameters such as microwave power, target voltage and gas pressure applied to the SWP source. Raman spectra proved the structure of these carbon films prepared by SWP technique is typical diamond-like carbon (DLC). The analysis on G peak position and intensity ratio ID/IG indicated that Raman shifts moves to low wavenumber and ID/IG decreases with the increasing of microwave power from 150 W to 330 W. These results means the formation of sp3 bond prefers higher microwave power. DLC films prepared at target voltage of -200 V have higher sp3 content than that of -350 V, moreover, an increase of gas pressure during experiments yields higher sp3 content at the microwave power below 270 W, whereas the change of sp3 content is slight with the various conditions when microwave power exceeds 270 W.

  10. Methods of Boron-carbon Deposited Film Removal

    Science.gov (United States)

    Airapetov, A.; Terentiev, V.; Voituk, A.; Zakharov, A.

    Boron carbide was proposed as a material for in-situ renewable protecting coating for tungsten tiles of the ITER divertor. It is necessary to develop a method of gasification of boron-carbon film which deposits during B4C sputtering. In this paper the results of the first stage investigation of gasification methods of boron-carbon films are presented. Two gasification methods of films are investigated: interaction with the ozone-oxygen mixture and irradiation in plasma with the working gas composed of oxygen, ethanol, and, in some cases, helium. The gasification rate in the ozone-oxygen mixture at 250 °C for B/C films with different B/C ratio and carbon fiber composite (CFC), was measured. For B/C films the gasification rate decreased with increasing B/C ratio (from 45 nm/h at B/C=0.7 to 4 nm/h at B/C=2.1; for CFC - 15 μm/h). Films gasification rates were measured under ion irradiation from ethanol-oxygen-helium plasma at different temperatures, with different ion energies and different gas mixtures. The maximum obtained removal rate was near 230 nm/h in case of ethanol-oxygen plasma and at 150°C of the sample temperature.

  11. Reactive pulsed laser deposition of gold nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Caricato, A.P. [University of Salento, Department of Physics, 73100 Lecce (Italy); Fernandez, M. [University of Salento, Department of Physics, 73100 Lecce (Italy); Leggieri, G. [University of Salento, Department of Physics, 73100 Lecce (Italy)]. E-mail: leggieri@le.infn.it; Luches, A. [University of Salento, Department of Physics, 73100 Lecce (Italy); Martino, M. [University of Salento, Department of Physics, 73100 Lecce (Italy); Romano, F. [University of Salento, Department of Physics, 73100 Lecce (Italy); Tunno, T. [University of Salento, Department of Physics, 73100 Lecce (Italy); Valerini, D. [University of Salento, Department of Physics, 73100 Lecce (Italy); Verdyan, A. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Soifer, Y.M. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Azoulay, J. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Meda, L. [IGD Polimeri Europa S.p.A, Novara (Italy)

    2007-07-31

    We report on the growth and characterization of gold nitride thin films on Si <1 0 0> substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N{sub 2} or NH{sub 3}). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 deg. C. Film resistivity was measured using a four-point probe and resulted in the (4-20) x 10{sup -8} {omega} m range, depending on the ambient pressure, to be compared with the value 2.6 x 10{sup -8} {omega} m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N{sub 2} phase. All these measurements point to the formation of the gold nitride phase.

  12. Reactive pulsed laser deposition of gold nitride thin films

    Science.gov (United States)

    Caricato, A. P.; Fernàndez, M.; Leggieri, G.; Luches, A.; Martino, M.; Romano, F.; Tunno, T.; Valerini, D.; Verdyan, A.; Soifer, Y. M.; Azoulay, J.; Meda, L.

    2007-07-01

    We report on the growth and characterization of gold nitride thin films on Si substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N 2 or NH 3). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 °C. Film resistivity was measured using a four-point probe and resulted in the (4-20) × 10 -8 Ω m range, depending on the ambient pressure, to be compared with the value 2.6 × 10 -8 Ω m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N 2 phase. All these measurements point to the formation of the gold nitride phase.

  13. DLC Films Deposited by the DC PACVD Method

    Directory of Open Access Journals (Sweden)

    D. Palamarchuk

    2003-01-01

    Full Text Available DLC (Diamond-Like Carbon coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  14. DLC Films Deposited by the DC PACVD Method

    OpenAIRE

    D. Palamarchuk; M. Zoriy; J. Gurovič; F. Černý; S. Konvičková; I. Hüttel

    2003-01-01

    DLC (Diamond-Like Carbon) coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition) method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  15. Very thin ITO/metal mesh hybrid films for a high-performance transparent conductive layer in GaN-based light-emitting diodes

    Science.gov (United States)

    Min, Jung-Hong; Kwak, Hoe-Min; Kim, Kiyoung; Jeong, Woo-Lim; Lee, Dong-Seon

    2017-01-01

    In this paper, we introduce very thin Indium tin oxide (ITO) layers (5, 10, and 15 nm) hybridized with a metal mesh to produce high-performance transparent conductive layers (TCLs) in near-ultraviolet light-emitting diodes (NUV LEDs). Using UV–vis–IR spectrometry, Hall measurement, and atomic force microscopy, we found that 10 nm was the optimal thickness for the very thin ITO layers in terms of outstanding transmittance and sheet resistance values as well as stable contact properties when hybridized with the metal mesh. The proposed layers showed a value of 4.56 Ω/□ for sheet resistance and a value of 89.1% for transmittance. Moreover, the NUV LEDs fabricated with the hybrid TCLs achieved ∼140% enhanced light output power compared to that of 150 nm thick ITO layers. Finally, to verify the practical usage of the TCLs for industrial applications, we packaged the NUV LED chips and obtained improved turn-on voltage (3.48 V) and light output power (∼116%) performance.

  16. Effect of deposition temperature on the properties of Al-doped ZnO films prepared by pulsed DC magnetron sputtering for transparent electrodes in thin-film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Doo-Soo; Park, Ji-Hyeon; Shin, Beom-Ki; Moon, Kyeong-Ju [Information and Electronic Materials Research Laboratory, Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749 (Korea, Republic of); Son, Myoungwoo [Department of Nanobio Materials and Electronics, Gwangju Institute of Science and Technology, Gwangju 500-712 (Korea, Republic of); Ham, Moon-Ho [Department of Nanobio Materials and Electronics, Gwangju Institute of Science and Technology, Gwangju 500-712 (Korea, Republic of); School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712 (Korea, Republic of); Lee, Woong [School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim-Dong, Changwon, Gyeongnam 641-773 (Korea, Republic of); Myoung, Jae-Min, E-mail: jmmyoung@yonsei.ac.kr [Information and Electronic Materials Research Laboratory, Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749 (Korea, Republic of)

    2012-10-15

    Highlights: Black-Right-Pointing-Pointer Surface-textured AZO films were achieved by combining PDMS method with wet etching. Black-Right-Pointing-Pointer The AZO film deposited at 230 Degree-Sign C by PDMS exhibited the best performance. Black-Right-Pointing-Pointer It is due to the higher plasma density supplied from PDMS system. Black-Right-Pointing-Pointer Wet etching of the films produces a crater-like rough surface morphology. - Abstract: A simple but scalable approach to the production of surface-textured Al-doped ZnO(AZO) films for low-cost transparent electrode applications in thin-film solar cells is introduced in this study by combining pulsed dc magnetron sputtering (PDMS) with wet etching in sequence. First, structural, electrical, and optical properties of the AZO films prepared by a PDMS were investigated as functions of deposition temperature to obtain transparent electrode films that can be used as indium-free alternative to ITO electrodes. Increase in the deposition temperature to 230 Degree-Sign C accompanied the improvement in crystalline quality and doping efficiency, which enabled the lowest electrical resistivity of 4.16 Multiplication-Sign 10{sup -4} {Omega} cm with the carrier concentration of 1.65 Multiplication-Sign 10{sup 21} cm{sup -3} and Hall mobility of 11.3 cm{sup 2}/V s. The wet etching of the films in a diluted HCl solution resulted in surface roughening via the formation of crater-like structures without significant degradation in the electrical properties, which is responsible for the enhanced light scattering capability required for anti-reflective electrodes in thin film solar cells.

  17. Electrochemical growth of synthetic melanin thin films by constant potential methods

    Energy Technology Data Exchange (ETDEWEB)

    Kim, In Gyun; Nam, Hye Jin; Ahn, Hyeon Ju [Department of Chemistry, School of Chemical Materials Science, Institute of Basic Sciences, Sungkyunkwan Advanced Institute of NanoTechnology (SAINT), Sungkyunkwan University, Chunchun-dong, Gyunggi-do, Suwon 440-746 (Korea, Republic of); Jung, Duk-Young, E-mail: dyjung@skku.ed [Department of Chemistry, School of Chemical Materials Science, Institute of Basic Sciences, Sungkyunkwan Advanced Institute of NanoTechnology (SAINT), Sungkyunkwan University, Chunchun-dong, Gyunggi-do, Suwon 440-746 (Korea, Republic of)

    2011-02-28

    Polymerized melanin thin films were electrochemically synthesized in a 5,6-dihydroxyindole precursor solution on indium tin oxide (ITO) substrates using the cyclic voltammetry and constant potential methods. Tris(hydroxymethyl)aminomethane (THAM) and phosphate buffer solutions were applied to prepare the films that were well deposited to the ITO substrates. The films that were synthesized in the THAM buffer solution exhibited a faster growth rate and better adhesion to the ITO electrodes than the films in the phosphate buffer. The film thickness linearly increased at the growth rate of 0.8 nm/s as the deposition time and number of cycles increased. Two electrochemical conditions produced similar thicknesses as well as physical properties in each buffer solution. However, the constant potential method demonstrated that this provides the synthetic advantages of faster deposition and less consumption of electric charge compared to the cyclic voltammetry route.

  18. Magnetic Phases of Sputter Deposited Thin-Film Erbium

    Science.gov (United States)

    Witt, J. D. S.; Cooper, J. F. K.; Satchell, N.; Kinane, C. J.; Curran, P. J.; Bending, S. J.; Langridge, S.; Heyderman, L. J.; Burnell, G.

    2016-12-01

    We present a detailed structural and magnetic characterization of sputter deposited thin film erbium, determined by x-ray diffraction, transport measurements, magnetometry and neutron diffraction. This provides information on the onset and change of the magnetic state as a function of temperature and applied magnetic field. Many of the features of bulk material are reproduced. Also of interest is the identification of a conical magnetic state which repeats with a wavevector parallel to the c axis τc = 4/17 in units of the reciprocal lattice parameter c*, which is a state not observed in any other thin film or bulk measurements. The data from the various techniques are combined to construct magnetic field, temperature (H, T)–phase diagrams for the 200 nm-thick Er sample that serves as a foundation for future exploitation of this complex magnetic thin film system.

  19. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films

    Energy Technology Data Exchange (ETDEWEB)

    Shin Jinhong [Texas Materials Institute, University of Texas at Austin, Austin, TX 78750 (United States); Waheed, Abdul [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Winkenwerder, Wyatt A. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Kim, Hyun-Woo [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Agapiou, Kyriacos [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Jones, Richard A. [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Hwang, Gyeong S. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Ekerdt, John G. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States)]. E-mail: ekerdt@che.utexas.edu

    2007-05-07

    Chemical vapor deposition growth of amorphous ruthenium-phosphorus films on SiO{sub 2} containing {approx} 15% phosphorus is reported. cis-Ruthenium(II)dihydridotetrakis-(trimethylphosphine), cis-RuH{sub 2}(PMe{sub 3}){sub 4} (Me = CH{sub 3}) was used at growth temperatures ranging from 525 to 575 K. Both Ru and P are zero-valent. The films are metastable, becoming increasingly more polycrystalline upon annealing to 775 and 975 K. Surface studies illustrate that demethylation is quite efficient near 560 K. Precursor adsorption at 135 K or 210 K and heating reveal the precursor undergoes a complex decomposition process in which the hydride and trimethylphosphine ligands are lost at temperatures as low at 280 K. Phosphorus and its manner of incorporation appear responsible for the amorphous-like character. Molecular dynamics simulations are presented to suggest the local structure in the films and the causes for phosphorus stabilizing the amorphous phase.

  20. Nanostructured zinc oxide thin film by simple vapor transport deposition

    Science.gov (United States)

    Athma, P. V.; Martinez, Arturo I.; Johns, N.; Safeera, T. A.; Reshmi, R.; Anila, E. I.

    2015-09-01

    Zinc oxide (ZnO) nanostructures find applications in optoelectronic devices, photo voltaic displays and sensors. In this work zinc oxide nanostructures in different forms like nanorods, tripods and tetrapods have been synthesized by thermal evaporation of zinc metal and subsequent deposition on a glass substrate by vapor transport in the presence of oxygen. It is a comparatively simpler and environment friendly technique for the preparation of thin films. The structure, morphology and optical properties of the synthesized nanostructured thin film were characterized in detail by using X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX) and photoluminescence (PL). The film exhibited bluish white emission with Commission International d'Eclairage (CIE) coordinates x = 0.22, y = 0.31.

  1. EPD-deposited ZnO thin films: a review

    Energy Technology Data Exchange (ETDEWEB)

    Verde, M.

    2014-07-01

    ZnO-based materials and specifically ZnO films with tailored morphology have been subjected to extensive research in the past few years due to their high potential for multiple prospective applications, mainly in electronics. Electrophoretic Deposition (EPD) constitutes an economical, eco friendly, low energy consuming and easily scalable alternative to the high energy consuming evaporative techniques which are commonly used for the obtaining of these ZnO films. For its application, however, the use of stable, well dispersed suspensions is a necessary requirement, and thus a thorough study of their colloidal chemistry is essential. In this work the main contributions to the study of colloidal chemistry of ZnO nanoparticle suspensions and their shaping into ZnO films by EPD are summarized. (Author)

  2. Carbon film deposition from high velocity rarefied flow

    Energy Technology Data Exchange (ETDEWEB)

    Rebrov, A.K., E-mail: rebrov@itp.nsc.ru; Emelyanov, A.A.; Yudin, I.B.

    2015-01-30

    The presented study is based on the idea of the activation of a gas-precursor high velocity flow by hot wire. The wire forms the channel for flow before expansion to substrate. The construction allows change of the specific flow rate, velocity, composition and temperature of a gas mixture by studying the film synthesis in conditions from free molecular to continuum flow at velocities from hundreds to thousands of m/s. At a high pressure, the film has typical and unusual hexagonal incorporations for diamond tetragonal particles. Raman spectrum with the pronounced diamond peak is typical for diamond-like film. X-ray diffraction points in the presence of lonsdaleite. Conditions of deposition were simulated by Monte Carlo method. Collisions with hot surfaces and chemical transformations were taken into consideration as well.

  3. Supercritical fluid molecular spray film deposition and powder formation

    Science.gov (United States)

    Smith, Richard D.

    1986-01-01

    Solid films are deposited, or fine powders formed, by dissolving a solid material into a supercritical fluid solution at an elevated pressure and then rapidly expanding the solution through a short orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate to deposit a solid thin film thereon, or discharged into a collection chamber to collect a fine powder. Upon expansion and supersonic interaction with background gases in the low pressure region, any clusters of solvent are broken up and the solvent is vaporized and pumped away. Solute concentration in the solution is varied primarily by varying solution pressure to determine, together with flow rate, the rate of deposition and to control in part whether a film or powder is produced and the granularity of each. Solvent clustering and solute nucleation are controlled by manipulating the rate of expansion of the solution and the pressure of the lower pressure region. Solution and low pressure region temperatures are also controlled.

  4. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Ciudad Universitaria, Carrera 30 Numero 45-03, Bogota (Colombia); Huerta, L. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)], E-mail: ser42@iim.unam.mx; Escamilla, R. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)

    2008-10-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T{sub C}). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T{sub C} values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T{sub C} was correlated to a higher contribution of the N 2p states.

  5. Efficacy of titanium doped-indium tin oxide (Ti/TiO2-ITO) films in rapid oxygen generation under photocatalysis and their suitability for bio-medical application.

    Science.gov (United States)

    Subrahmanyam, A; Rajakumar, A; Rakibuddin, Md; Paul Ramesh, T; Raveendra Kiran, M; Shankari, D; Chandrasekhar, K

    2014-12-07

    The present work describes in detail the photocatalytic properties of controlled titanium doped indium tin oxide (Ti/TiO2-ITO) composite thin films prepared by DC magnetron sputtering and their applicability to developing a bio-medical lung assistive device. The catalytic films of various thicknesses (namely, C1, C2, C3 and C4) were characterized using surface imaging (SEM), X-ray analyses (XRD and EDX), and Raman studies. The optical band gaps of the prepared films are ∼3.72-3.77 eV. Photocatalytic efficiencies of the film catalysts were investigated with the aid of a model organic molecule (Rhodamine B dye). The overall photodegradation capacity of the films was found to be slow kinetically, and the catalyst C1 was identified as having a better degradation efficiency (RhB 5 ppm, at pH 6.5) over 5 h under irradiation at 254 nm. The distinctive features of these composite films lie in their oxygen accumulation capacity and unique electron-hole pair separation ability. Investigations on oxygen species revealed the formation of superoxide radicals in aqueous systems (pH 6.5). The prepared films have TiO2 in the anatase phase in the surfaces, and possess the desired photocatalytic efficiency, compatibility to the heme system (are not involved in harmful hydroxyl radical production), and appreciable reusability. Especially, the thin films have a significant ability for mobilization of oxygen rapidly and continuously in aqueous medium under the irradiation conditions. Hence, these films may be a suitable choice for the photo-aided lung assistive design under development.

  6. Structural and electrical properties of electric field assisted spray deposited pea structured ZnO film

    Science.gov (United States)

    Chaturvedi, Neha; Swami, Sanjay Kumar; Dutta, Viresh

    2016-05-01

    Spray deposition of ZnO film was carried out. The uneven growth of ZnO nanostructures is resulted for spray deposited ZnO film. Application of DC voltage (1000V) during spray deposition provides formation of pea like structures with uniform coverage over the substrate. Electric field assisted spray deposition provides increased crystallinity with reduced resistivity and improved mobility of the ZnO film as compared to spray deposited ZnO film without electric field. This with large area deposition makes the process more efficient than other techniques.

  7. Atomic layer deposition of nanolaminate oxide films on Si

    Science.gov (United States)

    Tallarida, M.; Weisheit, M.; Kolanek, K.; Michling, M.; Engelmann, H. J.; Schmeisser, D.

    2011-11-01

    Among the methods for depositing thin films, atomic layer deposition is unique for its capability of growing conformal thin films of compounds with a control of composition and thickness at the atomic level. The conformal growth of thin films can be of particular interest for covering nanostructures since it assures the homogeneous growth of the ALD film in all directions, independent of the position of the sample with respect to the incoming precursor flow. Here we describe the technique for growing the HfO2/Al2O3 bilayer on Si substrate and our in situ approach for its investigation by means of synchrotron radiation photoemission. In particular, we study the interface interactions between the two oxides for various thickness compositions ranging from 0.4 to 2.7 nm. We find that the ALD of HfO2 on Si induces the increase of the interfacial SiO2 layer, and a change in the band bending of Si. On the contrary, the ALD of Al2O3 on HfO2 shows negligible interaction between layers as the binding energies of Hf4f, Si2p, and O1s core level peaks and the valence band maximum of HfO2 do not change and the interfacial SiO2 does not increase.

  8. Plasma-enhanced Deposition of Nano-Structured Carbon Films

    Institute of Scientific and Technical Information of China (English)

    Yang Qiaoqin (杨巧勤); Xiao Chijin (肖持进); A. Hirose

    2005-01-01

    By pre-treating substrate with different methods and patterning the catalyst, selective and patterned growth of diamond and graphitic nano-structured carbon films have been realized through DC Plasma-Enhanced Hot Filament Chemical Vapor Deposition (PE-HFCVD).Through two-step processing in an HFCVD reactor, novel nano-structured composite diamond films containing a nanocrystalline diamond layer on the top of a nanocone diamond layer have been synthesized. Well-aligned carbon nanotubes, diamond and graphitic carbon nanocones with controllable alignment orientations have been synthesized by using PE-HFCVD. The orientation of the nanostructures can be controlled by adjusting the working pressure. In a Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) reactor, high-quality diamond films have been synthesized at low temperatures (310 ℃~550 ℃) without adding oxygen or halogen gas in a newly developed processing technique. In this process, carbon source originates from graphite etching, instead of hydrocarbon. The lowest growth temperature for the growth of nanocrystalline diamond films with a reasonable growth rate without addition of oxygen or halogen is 260 ℃.

  9. Effects of Concentration and Substrate Type on Structure and Conductivity of p-Type CuS Thin Films Grown by Spray Pyrolysis Deposition

    Science.gov (United States)

    Sabah, Fayroz A.; Ahmed, Naser M.; Hassan, Z.

    2016-09-01

    Copper sulphide (CuS) thin films were grown upon Ti, indium tin oxide (ITO), and glass substrates by using spray pyrolysis deposition at 200°C. The films exhibited good adhesion compared to chemical bath deposition. CuCl2·2H2O and Na2S2O3·5H2O precursors were used as Cu2+ and S2- sources, respectively. Two concentrations (i.e., 0.2 M and 0.4 M) were selected in this study. X-ray diffraction analysis reveals that the films with 0.2 M showed only the formation of a covellite CuS phase having a hexagonal crystal structure with diffraction peaks of low intensity. For 0.4 M concentration, in addition to the covellite CuS phase, chalcocite Cu2S phase having a hexagonal crystal structure also appeared with relatively higher intensity peaks for all thin films. Field-emission scanning electron microscopy observations showed the formation of small grains for 0.2 M, whereas a mixture of grains with square-like shape and nanoplates were formed for 0.4 M. Depending on the 0.2 M and 0.4 M thin films thicknesses (3.2 μm and 4 μm, respectively), the band gap energy was obtained from optical measurements to be approximately 2.64 eV for 0.2 M (pure CuS phase), which slightly decreased up to 2.56 eV for 0.4 M concentration. Hall effect measurements showed that all grown films are p-type. The 0.2 M film exhibited much lower sheet resistance (R sh = 33.96 Ω/Sq-55.70 Ω/Sq) compared to 0.4 M film (R sh = 104.33 Ω/Sq-466.6 Ω/Sq). Moreover, for both concentrations, the films deposited onto ITO substrate showed the lowest sheet resistance (R sh = 33.96 Ω/Sq-104.33 Ω/Sq).

  10. Effects of Concentration and Substrate Type on Structure and Conductivity of p-Type CuS Thin Films Grown by Spray Pyrolysis Deposition

    Science.gov (United States)

    Sabah, Fayroz A.; Ahmed, Naser M.; Hassan, Z.

    2017-01-01

    Copper sulphide (CuS) thin films were grown upon Ti, indium tin oxide (ITO), and glass substrates by using spray pyrolysis deposition at 200°C. The films exhibited good adhesion compared to chemical bath deposition. CuCl2·2H2O and Na2S2O3·5H2O precursors were used as Cu2+ and S2- sources, respectively. Two concentrations (i.e., 0.2 M and 0.4 M) were selected in this study. X-ray diffraction analysis reveals that the films with 0.2 M showed only the formation of a covellite CuS phase having a hexagonal crystal structure with diffraction peaks of low intensity. For 0.4 M concentration, in addition to the covellite CuS phase, chalcocite Cu2S phase having a hexagonal crystal structure also appeared with relatively higher intensity peaks for all thin films. Field-emission scanning electron microscopy observations showed the formation of small grains for 0.2 M, whereas a mixture of grains with square-like shape and nanoplates were formed for 0.4 M. Depending on the 0.2 M and 0.4 M thin films thicknesses (3.2 μm and 4 μm, respectively), the band gap energy was obtained from optical measurements to be approximately 2.64 eV for 0.2 M (pure CuS phase), which slightly decreased up to 2.56 eV for 0.4 M concentration. Hall effect measurements showed that all grown films are p-type. The 0.2 M film exhibited much lower sheet resistance ( R sh = 33.96 Ω/Sq-55.70 Ω/Sq) compared to 0.4 M film ( R sh = 104.33 Ω/Sq-466.6 Ω/Sq). Moreover, for both concentrations, the films deposited onto ITO substrate showed the lowest sheet resistance ( R sh = 33.96 Ω/Sq-104.33 Ω/Sq).

  11. Luminescent Nanocrystalline Silicon Carbide Thin Film Deposited by Helicon Wave Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    LU Wan-bing; YU Wei; WU Li-ping; CUI Shuang-kui; FU Guang-sheng

    2006-01-01

    Hydrogenated nanocrystalline silicon carbide (SiC) thin films were deposited on the single-crystal silicon substrate using the helicon wave plasma enhanced chemical vapor deposition (HW-PECVD) technique. The influences of magnetic field and hydrogen dilution ratio on the structures of SiC thin film were investigated with the atomic force microscopy (AFM), the Fourier transform infrared absorption (FTIR) and the transmission electron microscopy (TEM). The results indicate that the high plasma activity of the helicon wave mode proves to be a key factor to grow crystalline SiC thin films at a relative low substrate temperature. Also, the decrease in the grain sizes from the level of microcrystalline to that of nanocrystalline can be achieved by increasing the hydrogen dilution ratios. Transmission electron microscopy measurements reveal that the size of most nanocrystals in the film deposited under the higher hydrogen dilution ratios is smaller than the doubled Bohr radius of 3C-SiC (approximately 5.4 nm), and the light emission measurements also show a strong blue photoluminescence at the room temperature, which is considered to be caused by the quantum confinement effect of small-sized SiC nanocrystals.

  12. Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method

    Directory of Open Access Journals (Sweden)

    Nutthanun Moolsradoo

    2010-01-01

    Full Text Available Sulfur-doped diamond-like carbon films (S-DLC fabricated from C2H2 and SF6 mixtures were used to study the effects of sulfur content and negative pulse bias voltage on the deposition and tribological properties of films prepared by plasma-based ion implantation (PBII. The structure and relative concentration of the films were analyzed by Raman spectroscopy and Auger electron spectroscopy. Hardness and elastic modulus of films were measured by nanoindentation hardness testing. Tribological characteristics of films were performed using a ball-on-disk friction tester. The results indicate that with the increasing sulfur content, the hardness and elastic modulus decrease. Additionally, by changing the negative pulse bias voltage from 0 kV to −5 kV, the hardness and elastic modulus increase, while the friction coefficient and specific wear rate tends to decrease. Moreover, at a negative pulse bias voltage of −5 kV and flow-rate ratio of 1 : 2, there is considerable improvement in friction coefficient of 0.05 under ambient air is due to the formation of a transfer films on the interface. The decrease in the friction coefficient of films doped with 4.9 at.% sulfur is greater under high vacuum (0.03 than under ambient air (>0.1.

  13. Late onset Ito's nevus

    Science.gov (United States)

    Resende, Cristina; Araújo, Catarina; Vieira, Ana Paula; Brito, Celeste

    2013-01-01

    Dermal melanocytoses include a variety of congenital and acquired melanocytic lesions characterised by the presence of multiple spindle-shaped dendritic melanocytes in the dermis. These lesions are commonly found in the skin of Asians, but they can also appear in Caucasians. The Mongolian spot, nevi of Ota and Ito are the most common morphological forms. We report a case of a 24-year-old Caucasian woman presented with a 10-months history of progressive darkening of the right side of her upper back. Cutaneous examination revealed a macular blue-grey hyperpigmentation of the right side of her upper back. Biopsy specimen from the macule showed multiple darkly pigmented, spindle-shaped dendritic melanocytes in the superficial dermis, interstitially arranged between collagen bundles. The diagnosis of nevus of Ito was established. Our patient is maintaining vigilance in dermatology consultation. PMID:23729678

  14. Late onset Ito's nevus.

    Science.gov (United States)

    Resende, Cristina; Araújo, Catarina; Vieira, Ana Paula; Brito, Celeste

    2013-05-30

    Dermal melanocytoses include a variety of congenital and acquired melanocytic lesions characterised by the presence of multiple spindle-shaped dendritic melanocytes in the dermis. These lesions are commonly found in the skin of Asians, but they can also appear in Caucasians. The Mongolian spot, nevi of Ota and Ito are the most common morphological forms. We report a case of a 24-year-old Caucasian woman presented with a 10-months history of progressive darkening of the right side of her upper back. Cutaneous examination revealed a macular blue-grey hyperpigmentation of the right side of her upper back. Biopsy specimen from the macule showed multiple darkly pigmented, spindle-shaped dendritic melanocytes in the superficial dermis, interstitially arranged between collagen bundles. The diagnosis of nevus of Ito was established. Our patient is maintaining vigilance in dermatology consultation.

  15. Scaling in film growth by pulsed laser deposition and modulated beam deposition.

    Science.gov (United States)

    Lee, Sang Bub

    2011-04-01

    The scalings in film growth by pulsed laser deposition (PLD) and modulated beam deposition (MBD) were investigated by Monte Carlo simulations. In PLD, an atomic pulse beam with a period t(0) were deposited instantaneously on a substrate, whereas in MBD, adatoms were deposited during a short time interval t(1) (0≤t(1)≤t(0)) within each period. If t(1)=0, MBD will be identical to PLD and, if t(1)=t(0), MBD will become usual molecular beam epitaxy (MBE). Specifically, logarithmic scaling was investigated for the nucleation density reported for PLD, and the scaling of island density was studied regarding the growth for 0MBE growth was observed as t(1) increased. The phase diagram was also presented.

  16. P-type thin films transistors with solution-deposited lead sulfide films as semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Carrillo-Castillo, A.; Salas-Villasenor, A.; Mejia, I. [Department of Materials Science and Engineering, The University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Aguirre-Tostado, S. [Centro de Investigacion en Materiales Avanzados, S. C. Alianza Norte 202, Parque de Investigacion e Innovacion Tecnologica, Apodaca, Nuevo Leon, C.P. 666000 (Mexico); Gnade, B.E. [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Quevedo-Lopez, M.A., E-mail: mxq071000@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States)

    2012-01-31

    In this paper we demonstrate p-type thin film transistors fabricated with lead sulfide (PbS) as semiconductor deposited by chemical bath deposition methods. Crystallinity and morphology of the resulting PbS films were characterized using X-ray diffraction, atomic force microscopy and scanning electron microscopy. Devices were fabricated using photolithographic processes in a bottom gate configuration with Au as source and drain top contacts. Field effect mobility for as-fabricated devices was {approx} 0.09 cm{sup 2} V{sup -1} s{sup -1} whereas the mobility for devices annealed at 150 Degree-Sign C/h in forming gas increased up to {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Besides the thermal annealing, the entire fabrications process was maintained below 100 Degree-Sign C. The electrical performance of the PbS-thin film transistors was studied before and after the 150 Degree-Sign C anneal as well as a function of the PbS active layer thicknesses. - Highlights: Black-Right-Pointing-Pointer Thin film transistors with PbS as semiconductor deposited by chemical bath deposition. Black-Right-Pointing-Pointer Photolithography-based thin film transistors with PbS films at low temperatures. Black-Right-Pointing-Pointer Electron mobility for anneal-PbS devices of {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Black-Right-Pointing-Pointer Highest mobility reported in thin film transistors with PbS as the semiconductor.

  17. The Effects of Two Thick Film Deposition Methods on Tin Dioxide Gas Sensor Performance

    OpenAIRE

    Bakrania, Smitesh D.; Margaret S. Wooldridge

    2009-01-01

    This work demonstrates the variability in performance between SnO2 thick film gas sensors prepared using two types of film deposition methods. SnO2 powders were deposited on sensor platforms with and without the use of binders. Three commonly utilized binder recipes were investigated, and a new binder-less deposition procedure was developed and characterized. The binder recipes yielded sensors with poor film uniformity and poor structural integrity, compared to the binder-less deposition meth...

  18. Short review on chemical bath deposition of thin film and characterization

    Energy Technology Data Exchange (ETDEWEB)

    Mugle, Dhananjay, E-mail: dhananjayforu@gmail.com; Jadhav, Ghanshyam, E-mail: ghjadhav@rediffmail.com [Depertment of Physics, Shri Chhatrapati Shivaji College, Omerga-413606 (India)

    2016-05-06

    This reviews the theory of early growth of the thin film using chemical deposition methods. In particular, it critically reviews the chemical bath deposition (CBD) method for preparation of thin films. The different techniques used for characterizations of the chemically films such as X-ray diffractometer (XRD), Scanning electron microscopy (SEM), Transmission electron microscopy (TEM), Electrical conductivity and Energy Dispersive Spectroscopy (EDS) are discussed. Survey shows the physical and chemical properties solely depend upon the time of deposition, temperature of deposition.

  19. Atomic layer deposition ultrathin film origami using focused ion beams

    Science.gov (United States)

    Supekar, O. D.; Brown, J. J.; Eigenfeld, N. T.; Gertsch, J. C.; Bright, V. M.

    2016-12-01

    Focused ion beam (FIB) micromachining is a powerful tool for maskless lithography and in recent years FIB has been explored as a tool for strain engineering. Ion beam induced deformation can be utilized as a means for folding freestanding thin films into complex 3D structures. FIB of high energy gallium (Ga+) ions induces stress by generation of dislocations and ion implantation within material layers, which create creases or folds upon mechanical relaxation enabled by motion of the material layers. One limitation on such processing is the ability to fabricate flat freestanding thin film structures. This capability is limited by the residual stresses formed during processing and fabrication of the films, which can result in initial curvature and deformation of films upon release from a sacrificial fabrication layer. This paper demonstrates folding in freestanding ultrathin films (1:1000) by ion-induced stress relaxation. The ultrathin flat structures are fabricated using atomic layer deposition on sacrificial polyimide. We have demonstrated vertical folding with 30 keV Ga+ ions in structures with lateral dimensions varying from 10 to 50 μm.

  20. Growth of the [110] oriented TiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells

    Directory of Open Access Journals (Sweden)

    LIJIAN eMENG

    2014-09-01

    Full Text Available TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure and shows a preferred orientation along the [101] direction. However, the nanorod structure has been obtained as the sputtering pressure is higher than 1 Pa. These nanorods structure TiO2 film shows a preferred orientation along the [110] direction. The phases of the deposited TiO2 films have been characterized by the x-ray diffraction and the Raman scattering measurements. All the films show an anatase phase and no other phase has been observed. The results of the SEM show that these TiO2 nanorods are perpendicular to the ITO substrate. The TEM measurement shows that the nanorods have a very rough surface. The dye-sensitized solar cells (DSSCs have been assembled using these TiO2 nanorod films prepared at different sputtering pressures as photoelectrode. And the effect of the sputtering pressure on the properties of the photoelectric conversion of the DSSCs has been studied.

  1. Pulsed laser deposition of fluoride glass thin films

    Science.gov (United States)

    Ganser, Dimitri; Gottmann, Jens; Mackens, Uwe; Weichmann, Ulrich

    2010-11-01

    The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF 4, BaF 2, LaF 3, AlF 3 and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of Pr:ZBLAN thin films using pulsed laser radiation of λ = 193 and λ = 248 nm. The deposition has been carried out on MgF 2 single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of λ = 193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of λ = 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, λ = 248 nm is not suitable for evaporation of Pr:ZBLAN.

  2. Pulsed laser deposition of fluoride glass thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ganser, Dimitri, E-mail: dimitri.ganser@llt.rwth-aachen.de [Chair for Laser Technology LLT, RWTH Aachen University, Steinbachstr. 15, D-52074 Aachen (Germany); Gottmann, Jens [Chair for Laser Technology LLT, RWTH Aachen University, Steinbachstr. 15, D-52074 Aachen (Germany); Mackens, Uwe; Weichmann, Ulrich [Philips Research Laboratories, Weisshausstrasse 2, D-52066 Aachen (Germany)

    2010-11-15

    The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF{sub 4}, BaF{sub 2}, LaF{sub 3}, AlF{sub 3} and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of Pr:ZBLAN thin films using pulsed laser radiation of {lambda} = 193 and {lambda} = 248 nm. The deposition has been carried out on MgF{sub 2} single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of {lambda} = 193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of {lambda} 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, {lambda} = 248 nm is not suitable for evaporation of Pr:ZBLAN.

  3. Resonant Infrared Matrix Assisted Pulsed Laser Deposition of Polymers: Improving the Morphology of As-Deposited Films

    Science.gov (United States)

    Bubb, Daniel; Papantonakis, Michael; Collins, Brian; Brookes, Elijah; Wood, Joshua; Gurudas, Ullas

    2008-03-01

    Resonant infrared matrix assisted pulsed laser deposition has been used to deposit thin films of PMMA, a widely used industrial polymer. This technique is similar to conventional pulsed laser deposition, except that the polymer to be deposited is dissolved in a solvent and the solution is frozen before ablation in a vacuum chamber. The laser wavelength is absorbed by a vibrational band in the frozen matrix. The polymer lands on the substrate to form a film, while the solvent is pumped away. Our preliminary results show that the surface roughness of the as-deposited films depends strongly on the differential solubility radius, as defined by Hansen solubility parameters of the solvent and the solubility radius of the polymer. Our results will be compared with computational and experimental studies of the same polymer using a KrF (248 nm) laser. The ejection mechanism will be discussed as well as the implications of these results for the deposition of smooth high quality films.

  4. Evaluation of ITO/GaAs solar cells

    Science.gov (United States)

    Sheldon, P.; Russell, P. E.; Nottenburg, R. N.; Emery, K. A.; Ireland, P. J.; Kazmerski, L. L.; Hayes, R. E.

    1982-03-01

    A technical evaluation of the ITO/GaAs solar cell emphasizing its performance-limiting factors is presented. Such solar cells, which are fabricated on p-type, Be-doped GaAs grown by molecular beam epitaxy, may incur buried homojunctions as a result of damage during the deposition of ITO by ion beam techniques. Heterojunction formation is found for minimally-disrupted GaAs surfaces, and Auger electron spectroscopy depth profiles are used to evaluate the chemical width of the ITO/GaAs interfaces along with electron beam-induced current measurements which electrically characterize the interface.

  5. Chemical bath deposition of indium sulphide thin films: preparation and characterization

    Energy Technology Data Exchange (ETDEWEB)

    Lokhande, C.D.; Ennaoui, A.; Patil, P.S.; Giersig, M.; Diesner, K.; Muller, M.; Tributsch, H. [Hahn-Meitner-Institut Berlin GmbH (Germany). Bereich Physikalische Chemie

    1999-02-26

    Indium sulphide (In{sub 2}S{sub 3}) thin films have been successfully deposited on different substrates under varying deposition conditions using chemical bath deposition technique. The deposition mechanism of In{sub 2}S{sub 3} thin films from thioacetamide deposition bath has been proposed. Films have been characterized with respect to their crystalline structure, composition, optical and electrical properties by means of X-ray diffraction, TEM, EDAX, optical absorption, TRMC (time resolved microwave conductivity) and RBS. Films on glass substrates were amorphous and on FTO (flourine doped tin oxide coated) glass substrates were polycrystalline (element of phase). The optical band gap of In{sub 2}S{sub 3} thin film was estimated to be 2.75 eV. The as-deposited films were photoactive as evidenced by TRMC studies. The presence of oxygen in the film was detected by RBS analysis. (orig.) 27 refs.

  6. Direct current magnetron sputter-deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Hoon, Jian-Wei [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Chan, Kah-Yoong, E-mail: kychan@mmu.edu.my [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Krishnasamy, Jegenathan; Tou, Teck-Yong [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Knipp, Dietmar [School of Engineering and Science, Jacobs University Bremen, 28759 Bremen (Germany)

    2011-01-15

    Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 deg. C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.

  7. Effects of increasing nitrogen concentration on the structure of carbon nitride films deposited by ion beam assisted deposition

    OpenAIRE

    Hammer, P.; Victoria, NM; F Alvarez

    2000-01-01

    Amorphous carbon nitride films containing increasing concentrations of nitrogen were deposited by ion beam assisted deposition at a substrate temperature of 150 degrees C. The relationship between the deposition conditions and the chemical bonding structure was investigated by x-ray photoelectron, ultraviolet photoelectron, infrared, and Raman spectroscopies. Film properties were examined by ultraviolet-vis spectroscopy, conductivity, hardness, density, and internal stress measurements. The e...

  8. Zero added oxygen for high quality sputtered ITO: A data science investigation of reduced Sn-content and added Zr

    Energy Technology Data Exchange (ETDEWEB)

    Peshek, Timothy J. [The School for the Engineering of Matter, Transport and Energy, Arizona State University, Tempe, Arizona 85287 and The National Center for Photovoltaics, The National Renewable Energy Laboratory, Golden, Colorado 80401 (United States); Burst, James M.; Coutts, Timothy J.; Gessert, Timothy A., E-mail: tjp3@case.edu [The National Center for Photovoltaics, The National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

    2016-03-15

    The authors demonstrate mobilities of >45 cm{sup 2}/V s for sputtered tin-doped indium oxide (ITO) films at zero added oxygen. All films were deposited with 5 wt. % SnO{sub 2}, instead of the more conventional 8–10 wt. %, and had varying ZrO{sub 2} content from 0 to 3 wt. %, with a subsequent reduction in In{sub 2}O{sub 3} content. These films were deposited by radio-frequency magnetron sputtering from nominally stoichiometric targets with varying oxygen partial pressure in the sputter ambient. Anomalous behavior was discovered for films with no Zr-added, where a bimodality of high and low mobilities was discovered for nominally similar growth conditions. However, all films showed the lowest resistivity and highest mobilities when the oxygen partial pressure in the sputter ambient was zero. This result is contrasted with several other reports of ITO transport performance having a maximum for small but nonzero oxygen partial pressure. This result is attributed to the reduced concentration of SnO{sub 2}. The addition of ZrO{sub 2} yielded the highest mobilities at >55 cm{sup 2}/V s and the films showed a modest increase in optical transmission with increasing Zr-content.

  9. Induced recrystallization of CdTe thin films deposited by close-spaced sublimation

    Science.gov (United States)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Mayo, B.; Levi, D. H.; Kazmerski, L. L.

    1999-03-01

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl2 treatment at 350 °C and completely recrystallized after the same treatment at 400 °C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl2 are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  10. Tribological Properties of DLC Film Prepared by C + Ion Beam-assisted Deposition (IBAD)

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    C + ion beam-assisted deposition was utilized to prepare deposit diamond-like carbon (DLC) film.With the help of a series of experiments such as Raman spectroscopy, FT- IR spectroscopy, AFM and nanoindentation, the DLC film has been recognized as hydrogenated DLC film and its tribological properties have been evaluated.The ball-on-disc testing results show that the hardness and the tribological properties of the DLC film produced by C + ion beam-assisted deposition are improved significandy.DLC film produced by C+ ion beam-assisted deposition is positive to have a prosperous tribological application in the near future.

  11. Induced Recrystallization of CdTe Thin Films Deposited by Close-Spaced Sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Levi, D. H.; Kazmerski, L. L. (National Renewable Energy Laboratory); Mayo, B. (Southern University and A& M College, Baton Rouge, LA)

    1998-10-26

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl2 treatment at 350 C and completely recrystallized after the same treatment at 400 C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl2 are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  12. Induced Recrystallization of CdTe Thin Films Deposited by Close-Spaced Sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Levi, D. H.; Kazmerski, L. L. (National Renewable Energy Laboratory); Mayo, B. (Southern University and A& M College, LA)

    1998-10-29

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl{sub 2} treatment at 350 C and completely recrystallized after the same treatment at 400 C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl{sub 2} are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  13. Atomistic study of deposition process of Al thin film on Cu substrate

    Energy Technology Data Exchange (ETDEWEB)

    Cao Yongzhi, E-mail: yzcaohit@gmail.com [Center for Precision Engineering, Harbin Institute of Technology, Harbin (China); Zhang Junjie; Sun Tao; Yan Yongda; Yu Fuli [Center for Precision Engineering, Harbin Institute of Technology, Harbin (China)

    2010-08-01

    In this paper we report molecular dynamics based atomistic simulations of deposition process of Al atoms onto Cu substrate and following nanoindentation process on that nanostructured material. Effects of incident energy on the morphology of deposited thin film and mechanical property of this nanostructured material are emphasized. The results reveal that the morphology of growing film is layer-by-layer-like at incident energy of 0.1-10 eV. The epitaxy mode of film growth is observed at incident energy below 1 eV, but film-mixing mode commences when incident energy increase to 10 eV accompanying with increased disorder of film structure, which improves quality of deposited thin film. Following indentation studies indicate deposited thin films pose lower stiffness than single crystal Al due to considerable amount of defects existed in them, but Cu substrate is strengthened by the interface generated from lattice mismatch between deposited Al thin film and Cu substrate.

  14. ITO Modification for Efficient Inverted Organic Solar Cells.

    Science.gov (United States)

    Susarova, Diana K; Akkuratov, Alexander V; Kukharenko, Andrey I; Cholakh, Seif O; Kurmaev, Ernst Z; Troshin, Pavel A

    2017-10-03

    We demonstrate a facile approach to designing transparent electron-collecting electrodes by depositing thin layers of medium and low work function metals on top of transparent conductive metal oxides (TCOs) such as ITO and FTO. The modified electrodes were fairly stable for months under ambient conditions and maintained their electrical characteristics. XPS spectroscopy data strongly suggested integration of the deposited metal in the TCO structure resulting in additional doping of the conducting oxide at the interface. Kelvin probe microscopy measurements revealed a significant decrease in the ITO work function after modification. Organic solar cells based on three different conjugated polymers have demonstrated state of the art performances in inverted device geometry using Mg- or Yb-modified ITO as electron collecting electrode. The simplicity of the proposed approach and the excellent ambient stability of the modified ITO electrodes allows one to expect their wide utilization in research laboratories and electronic industry.

  15. ITO玻璃在线等离子体清洗的研究%On-line Plasma Cleaning of Glass Substrates of ITO Film

    Institute of Scientific and Technical Information of China (English)

    吴桂初; 王德苗; 任高潮; 陈抗生

    2001-01-01

    通过在线等离子体清洗的玻璃基片表面沉积的ITO(或SiO2)膜,不仅具有优良的光电特性,而且提高了膜层在基片上的附着力.与未经在线等离子体清洗的基片沉积的ITO膜相比,膜层附着力提高了3.5倍.此项成果已在ITO膜透明导电玻璃连续生产线上得到应用.

  16. Controlled Mechanical Cracking of Metal Films Deposited on Polydimethylsiloxane (PDMS

    Directory of Open Access Journals (Sweden)

    Andreas Polywka

    2016-09-01

    Full Text Available Stretchable large area electronics conform to arbitrarily-shaped 3D surfaces and enables comfortable contact to the human skin and other biological tissue. There are approaches allowing for large area thin films to be stretched by tens of percent without cracking. The approach presented here does not prevent cracking, rather it aims to precisely control the crack positions and their orientation. For this purpose, the polydimethylsiloxane (PDMS is hardened by exposure to ultraviolet radiation (172 nm through an exposure mask. Only well-defined patterns are kept untreated. With these soft islands cracks at the hardened surface can be controlled in terms of starting position, direction and end position. This approach is first investigated at the hardened PDMS surface itself. It is then applied to conductive silver films deposited from the liquid phase. It is found that statistical (uncontrolled cracking of the silver films can be avoided at strain below 35%. This enables metal interconnects to be integrated into stretchable networks. The combination of controlled cracks with wrinkling enables interconnects that are stretchable in arbitrary and changing directions. The deposition and patterning does not involve vacuum processing, photolithography, or solvents.

  17. Substrate heating measurements in pulsed ion beam film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Olson, J.C.; Davis, H.A.; Rej, D.J.; Waganaar, W.J. [Los Alamos National Lab., NM (United States); Tallant, D.R. [Cornell Univ., Ithaca, NY (United States). Materials Science and Engineering Dept.; Thompson, M.O. [Sandia National Labs., Albuquerque, NM (United States)

    1995-05-01

    Diamond-like Carbon (DLC) films have been deposited at Los Alamos National Laboratory by pulsed ion beam ablation of graphite targets. The targets were illuminated by an intense beam of hydrogen, carbon, and oxygen ions at a fluence of 15-45 J/cm{sup 2}. Ion energies were on the order of 350 keV, with beam current rising to 35 kA over a 400 ns ion current pulse. Raman spectra of the deposited films indicate an increasing ratio of sp{sup 3} to sp{sup 2} bonding as the substrate is moved further away from the target and further off the target normal. Using a thin film platinum resistor at varying positions, we have measured the heating of the substrate surface due to the kinetic energy and heat of condensation of the ablated material. This information is used to determine if substrate heating is responsible for the lack of DLC in positions close to the target and near the target normal. Latest data and analysis will be presented.

  18. Electroless deposition, post annealing and characterization of nickel films on silicon

    Indian Academy of Sciences (India)

    Subir Sabharwal; Siddharth Palit; R B Tokas; A K Poswal; Sangeeta

    2008-10-01

    Electroless deposition of nickel (EN) films on -type silicon has been investigated under different process conditions. The interface between the film and substrate has been characterized for electrical properties by probing the contact resistances. X-ray diffraction and atomic force microscopy have been performed to obtain information about the structural and morphological details of the films. As a comparative study, nickel films have also been sputter deposited on silicon substrates. An as-deposited electroless film is observed to form non-ohmic contact while in a sputtered film prepared without the application of substrate heating, the formation of metal–insulating–semiconductor type junction is seen.

  19. Pulsed laser deposition of permanent magnetic Nd2Fe14B thin films

    NARCIS (Netherlands)

    Geurtsen, A.J.M.; Kools, J.C.S.; Wit, L.; Lodder, J.C.

    1996-01-01

    Pulsed Laser Deposition (PLD) is applied to deposit thin (thickness typically 100 nm) films of Nd2Fe14B. It is shown that films can be grown which have the desired composition and phase. Nd2Fe14B grows with the c-axis along the film normal on 110 Al2O3 single crystal substrates covered with a Ta lay

  20. Pulsed laser deposition of Cu-Sn-S for thin film solar cells

    DEFF Research Database (Denmark)

    Ettlinger, Rebecca Bolt; Crovetto, Andrea; Bosco, Edoardo

    Thin films of copper tin sulfide were deposited from a target of the stoichiometry Cu:Sn:S ~1:2:3 using pulsed laser deposition (PLD). Annealing with S powder resulted in films close to the desired Cu2SnS3 stoichiometry although the films remained Sn rich. Xray diffraction showed that the final...

  1. Pure and Sn-doped ZnO films produced by pulsed laser deposition

    DEFF Research Database (Denmark)

    Holmelund, E.; Schou, Jørgen; Tougaard, S.;

    2002-01-01

    A new technique, metronome doping, has been used for doping of films during pulsed laser deposition (PLD). This technique makes it possible to dope continuously during film growth with different concentrations of a dopant in one deposition sequence. Films of pure and doped ZnO have been produced...

  2. Deposition of highly (111)-oriented PZT thin films by using metal organic chemical deposition

    CERN Document Server

    Bu, K H; Choi, D K; Seong, W K; Kim, J D

    1999-01-01

    Lead zirconate titanate (PZT) thin films have been grown on Pt/Ta/SiNx/Si substrates by using metal organic chemical vapor deposition with Pb(C sub 2 H sub 5) sub 4 , Zr(O-t-C sub 4 H sub 9) sub 4 , and Ti(O-i-C sub 3 H sub 7) sub 4 as source materials and O sub 2 as an oxidizing gas. The Zr fraction in the thin films was controlled by varying the flow rate of the Zr source material. The crystal structure and the electrical properties were investigated as functions of the composition. X-ray diffraction analysis showed that at a certain range of Zr fraction, highly (111)-oriented PZT thin films with no pyrochlore phases were deposited. On the other hand, at low Zr fractions, there were peaks from Pb-oxide phases. At high Zr fractions, peaks from pyrochlore phase were seen. The films also showed good electrical properties, such as a high dielectric constant of more than 1200 and a low coercive voltage of 1.35 V.

  3. Properties of HfAlO film deposited by plasma enhanced atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cao, Duo [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Cheng, Xinhong, E-mail: xh_cheng@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Jia, Tingting; Zheng, Li; Xu, Dawei; Wang, Zhongjian; Xia, Chao; Yu, Yuehui [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China)

    2013-07-15

    Plasma enhanced atomic layer deposition (PEALD) method can reduce film growing temperature, and allow in situ plasma treatment. In this work, HfAlO and HfO{sub 2} films were deposited with PEALD at 160 °C. Microstructure analysis showed that both films were amorphous after rapid thermal annealing (RTA) treatment, and HfAlO sample showed better interfacial structure than HfO{sub 2}. X-ray photoelectron spectroscopy (XPS) spectra indicated that main component of the interfacial layer of HfAlO sample was Hf–Si–O and Al–Si–O bonds, the valence band offset value between the HfAlO film and Si substrate was calculated to be 2.5 eV. The dominant leakage current mechanism of the samples was Schottky emission at a low electric field (<1.4 MV/cm), and Poole–Frenkel emission mechanism at a higher electric field (>1.4 MV/cm). The equivalent oxide thicknesses (EOT) of the HfAlO samples were 1.0 nm and 1.3 nm, respectively. The density of interface states between dielectric and substrate were calculated to be 1.2 × 10{sup 12} eV{sup −1}cm{sup −2} and 1.3 × 10{sup 12} eV{sup −1}cm{sup −2}, respectively. In comparison with HfO{sub 2} film, HfAlO film has good interfacial structure and electrical performance.

  4. Influence of oxygen flow rate on properties of indium tin oxide thin films prepared by ion-assisted electron beam evaporation

    Directory of Open Access Journals (Sweden)

    Artorn Pokaipisit

    2009-11-01

    Full Text Available Indium tin oxide (ITO thin films with various oxygen flow rates were deposited onto glass substrates by ion-assistedelectron beam evaporation. All other deposition parameters were kept constant. The electrical and optical properties of theITO thin films have been investigated as a function of oxygen flow rate. Optical transmittance and optical band gap energy were measured by spectrophotometer. Sheet resistance was measured by four-point probe method. It has been found that an oxygen flow rate at 12 sccm was suitable for improving the properties of ITO thin films. The resistivity and optical transmittance of ITO thin films were 7.210-4 -cm and 84%, respectively. The optical band gap was 4.19 eV.

  5. Vapor deposition of polystyrene thin films by intense laser vibrational excitation

    DEFF Research Database (Denmark)

    Bubb, D.M.; Papantonakis, M.R.; Horwitz, J.S.

    2002-01-01

    Polystyrene films were deposited using resonant infrared pulsed laser depositions (RIR-PLD). Thin films were grown on Si(1 1 1) wafers and NaCl substrates and analyzed by Fourier transform infrared spectroscopy (FTIR) and gel permeation chromatography (GPC). The depositions were carried out...

  6. Properties of alumina films by atmospheric pressure metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Corbach, van H.D.; Fransen, T.; Gellings, P.J.

    1994-01-01

    Thin alumina films were deposited at low temperatures (290–420°C) on stainless steel, type AISI 304. The deposition process was carried out in nitrogen by metal-organic chemical vapour deposition using aluminum tri-sec-butoxide. The film properties including the protection of the underlying substrat

  7. Study of Nanocrystalline Diamond Film Deposited Rapidly by 500 W Excimer Laser

    Institute of Scientific and Technical Information of China (English)

    PENG Hongyan; SHEN Jiajing; YANG Guilong

    2000-01-01

    High quality nanocrystalline diamond film deposited rapidly by an XeCl excimer laser operated at high laser power (500 W) and repetition rate (300~500 Hz) is presented. A high deposition rate, 250 nm/thousand pulses, was obtained. The effects of laser energy fluence and repetition rate on the deposition of diamond film were investigated.

  8. The spatial thickness distribution of metal films produced by large area pulsed laser deposition

    DEFF Research Database (Denmark)

    Pryds, Nini; Schou, Jørgen; Linderoth, Søren

    2007-01-01

    Thin films of metals have been deposited in the large-area Pulsed Laser Deposition (PLD) Facility at Riso National Laboratory. Thin films of Ag and Ni were deposited with laser pulses from an excimer laser at 248 nm with a rectangular beam spot at a fluence of 10 J/cm(2) on glass substrates of 12...

  9. Phase change properties of Ti-Sb-Te thin films deposited by thermal atomic layer deposition

    Science.gov (United States)

    Song, Sannian; Shen, Lanlan; Song, Zhitang; Yao, Dongning; Guo, Tianqi; Li, Le; Liu, Bo; Wu, Liangcai; Cheng, Yan; Ding, Yuqiang; Feng, Songlin

    2016-10-01

    Phase change random access memory (PCM) appears to be the strongest candidate for next-generation high density nonvolatile memory. The fabrication of ultrahigh density PCM depends heavily on the thin film growth technique for the phase changing chalcogenide material. In this study, TiSb2Te4 (TST) thin films were deposited by thermal atomic layer deposition (ALD) method using TiCl4, SbCl3, (Et3Si)2Te as precursors. The threshold voltage for the cell based on thermal ALD-deposited TST is about 2.0 V, which is much lower than that (3.5 V) of the device based on PVD-deposited Ge2Sb2Te5 (GST) with the identical cell architecture. Tests of TST-based PCM cells have demonstrated a fast switching rate of 100 ns. Furthermore, because of the lower melting point and thermal conductivities of TST materials, TST-based PCM cells exhibit 19% reduction of pulse voltages for Reset operation compared with GST-based PCM cells. These results show that thermal ALD is an attractive method for the preparation of phase change materials.

  10. Investigation of nanostructured transparent conductive films grown by rotational-sequential-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lu, Jong-Hong, E-mail: jonghonglu@mail.mcut.edu.tw; Chen, Bo-Ying; Wang, Chih-Hsuan [Department of Materials Engineering, Ming Chi University of Technology, 84 Gungjuan Rd., Taishan Dist. New Taipei City 24301, Taiwan and Center for Thin Film Technologies and Applications, Ming Chi University of Technology, 84 Gungjuan Rd., Taishan Dist. New Taipei City 24301, Taiwan (China)

    2014-03-15

    This study fabricates three types of nanostructured conductive transparent films using a rotational-sequential-sputtering method. These films include (1) TiO{sub 2}/indium-tin oxide (ITO) and SiO{sub x}/ITO nanomultilayer films, the optical refractive indices of which can be manipulated in the range of 2.42–1.63 at a wavelength of 550 nm with a controlled resistivity range of 1 × 10{sup −3} to 2 × 10{sup −4} Ω·cm. (2) Multilayer ITO films are deposited on polyethylene terephthalate substrates, providing good flexibility and resistivity as low as 5 × 10{sup −4} Ω·cm. Finally, (3) ultrathin ITO films ranging from subnanometer to a few nanometers in thickness enable exploration of ITO film growth and thermal stability. X-ray reflection characterization provides a rapid, non-destructive method to measure the single-layer thicknesses of the nanomultilayer films and ultrathin ITO films at subnanoscale resolution.

  11. Electrical and optical properties of thin indium tin oxide films produced by pulsed laser ablation in oxygen or rare gas atmospheres

    DEFF Research Database (Denmark)

    Thestrup, B.; Schou, Jørgen; Nordskov, A.

    1999-01-01

    Films of indium tin oxide (ITO) have been produced in different background gases by pulsed laser deposition (PLD). The Films deposited in rare gas atmospheres on room temperature substrates were metallic, electrically conductive, but had poor transmission of visible light. For substrate...

  12. Verification of cell irradiation dose deposition using a radiochromic film

    Energy Technology Data Exchange (ETDEWEB)

    Tomic, N [Department of Radiation Oncology, Jewish General Hospital, McGill University, Montreal, Quebec (Canada); Gosselin, M [Department of Radiation Oncology, Jewish General Hospital, McGill University, Montreal, Quebec (Canada); Wan, Jonathan F [Radiation Oncology Department, McGill University Health Centre, Montreal, Quebec (Canada); Saragovi, Uri [Department of Pharmacology, McGill University, Montreal, Quebec (Canada); Podgorsak, E B [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada); Evans, M [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada); Devic, S [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada)

    2007-06-07

    We describe a technique for the MTT assay that irradiates all cells at once by a combination of couch movement and a step-and-shoot irradiation technique on a linear accelerator with 6 MV and 18 MV photon beams. In two experimental setups, we obtained maximum to minimum dose ranges of 10 for the constant MU/bin (monitor units per bin) setup and 20 for the variable MU/bin technique. The irradiation technique described is dose rate independent and it can be used on any teletherapy irradiation machine. We also employed radiochromic film dosimetry to verify dose delivered in each of the wells within the dish. It is shown that for the lowest doses, relative dose variation within wells reaches a value of 6%. We also demonstrated that the radiochromic film positioned below the 96-well plate does not underestimate dose deposited within each compartment by more than 2% due to the vertical dose gradient.

  13. Verification of cell irradiation dose deposition using a radiochromic film

    Science.gov (United States)

    Tomic, N.; Gosselin, M.; Wan, Jonathan F.; Saragovi, Uri; Podgorsak, E. B.; Evans, M.; Devic, S.

    2007-06-01

    We describe a technique for the MTT assay that irradiates all cells at once by a combination of couch movement and a step-and-shoot irradiation technique on a linear accelerator with 6 MV and 18 MV photon beams. In two experimental setups, we obtained maximum to minimum dose ranges of 10 for the constant MU/bin (monitor units per bin) setup and 20 for the variable MU/bin technique. The irradiation technique described is dose rate independent and it can be used on any teletherapy irradiation machine. We also employed radiochromic film dosimetry to verify dose delivered in each of the wells within the dish. It is shown that for the lowest doses, relative dose variation within wells reaches a value of 6%. We also demonstrated that the radiochromic film positioned below the 96-well plate does not underestimate dose deposited within each compartment by more than 2% due to the vertical dose gradient.

  14. Comparison of the properties of Pb thin films deposited on Nb substrate using thermal evaporation and pulsed laser deposition techniques

    Energy Technology Data Exchange (ETDEWEB)

    Perrone, A., E-mail: alessio.perrone@unisalento.it [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); INFN-Istituto Nazionale di Fisica Nucleare e Università del Salento, 73100 Lecce (Italy); Gontad, F. [INFN-Istituto Nazionale di Fisica Nucleare e Università del Salento, 73100 Lecce (Italy); Lorusso, A.; Di Giulio, M. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Broitman, E. [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Ferrario, M. [Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare, 00044 Frascati (Italy)

    2013-11-21

    Pb thin films were prepared at room temperature and in high vacuum by thermal evaporation and pulsed laser deposition techniques. Films deposited by both the techniques were investigated by scanning electron microscopy to determine their surface topology. The structure of the films was studied by X-ray diffraction in θ–2θ geometry. The photoelectron performances in terms of quantum efficiency were deduced by a high vacuum photodiode cell before and after laser cleaning procedures. Relatively high quantum efficiency (>10{sup −5}) was obtained for all the deposited films, comparable to that of corresponding bulk. Finally, film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Weak and strong points of these two competitive techniques are illustrated and discussed. -- Highlights: •Comparison of Pb thin films deposited on Nb substrate by thermal evaporation and pulsed laser deposition (PLD). •Photoelectron performances of Pb thin films. •Good quality of adhesion strength of Pb films deposited by PLD.

  15. Dependence of electro-optical properties on the deposition conditions of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Lately, there has been a sharp increase in the publication of papers on chemical bath deposition of CdS thin films and related materials due to successful results obtained using this method to fabricate CdS thin-film buffer layers for CuInSe{sub 2}- and CdTe-based polycrystalline thin-film solar cells. Generally, these papers focus on previously proposed methods of studying film characteristics without a systematic study of the influence of deposition conditions on film characteristics. In this paper the authors present an exhaustive study of the chemical bath-deposited CdS thin films electro-optical properties dependence on deposition variables. The authors propose not only a set of conditions for obtaining CdS thin films by this method but additionally, suitable deposition process conditions for certain application requirements, such as buffer layers for thin-film solar cells. The observed electro-optical characteristics dependence on the deposition variables corroborates the chemical mechanism that they proposed previously for this process.

  16. Hydrogenated Silicon Carbide Thin Films Prepared with High Deposition Rate by Hot Wire Chemical Vapor Deposition Method

    Directory of Open Access Journals (Sweden)

    M. M. Kamble

    2014-01-01

    Full Text Available Structural, optical, and electrical properties of hydrogenated silicon carbide (SiC:H films, deposited from silane (SiH4 and methane (CH4 gas mixture by HW-CVD method, were investigated. Film properties are carefully and systematically studied as function of deposition pressure which is varied between 200 mTorr and 500 mTorr. The deposition rate is found to be reasonably high (9.4 nm/s films is confirmed by FTIR, Raman, and XPS analysis. XRD and Raman analysis revealed that with increasing deposition pressure amorphization occurs in SiC:H films. FTIR spectroscopy analysis shows that bond density of C–H decreases while Si–C and Si–H bond densities increase with increasing deposition pressure. Total hydrogen content increases with increasing deposition pressure and was found to be <20 at.%. The absence of band ~1300–1600 cm−1 in the Raman spectra implies negligible C–C bond concentration and formation of nearly stoichiometric SiC:H films. The band gap shows increasing trend with increasing deposition pressure. The high value of Urbach energy suggests increased structural disorder in SiC:H films. Finally, it has been concluded that CH4 can be used as effective carbon source in HW-CVD method to prepare stoichiometric SiC:H films.

  17. A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD

    Directory of Open Access Journals (Sweden)

    Meysam Zarchi

    2015-03-01

    Full Text Available The effect of new growth techniques on the mobility and stability of amorphous silicon (a-Si:H thin film transistors (TFTs has been studied. It was suggested that the key parameter controlling the field-effect mobility and stability is the intrinsic stress in the a-Si:H layer. Amorphous and microcrystalline silicon films were deposited by radiofrequency plasma enhanced chemical vapor deposition (RF-PECVD and hot-wire chemical vapor deposition (HW-CVD at 100 ºC and 25 ºC. Structural properties of these films were measured by Raman Spectroscopy. Electronic properties were measured by dark conductivity, σd, and photoconductivity, σph. For amorphous silicon films deposited by RF-PECVD on PET, photosensitivity's of >105 were obtained at both 100 º C and 25 ºC. For amorphous silicon films deposited by HW-CVD, a photosensitivity of > 105 was obtained at 100 ºC. Microcrystalline silicon films deposited by HW-CVD at 95% hydrogen dilution show σph~ 10-4 Ω-1cm-1, while maintaining a photosensitivity of ~102 at both 100 ºC and 25 ºC. Microcrystalline silicon films with a large crystalline fraction (> 50% can be deposited by HW-CVD all the way down to room temperature.

  18. Hybrid Graphene and Single-Walled Carbon Nanotube Films for Enhanced Phase-Change Heat Transfer.

    Science.gov (United States)

    Seo, Han; Yun, Hyung Duk; Kwon, Soon-Yong; Bang, In Cheol

    2016-02-10

    Nucleate boiling is an effective heat transfer method in power generation systems and cooling devices. In this letter, hybrid graphene/single-walled carbon nanotube (SWCNT), graphene, and SWCNT films deposited on indium tin oxide (ITO) surfaces were fabricated to investigate the enhancement of nucleate boiling phenomena described by the critical heat flux and heat transfer coefficient. The graphene films were grown on Cu foils and transferred to ITO surfaces. Furthermore, SWCNTs were deposited on the graphene layer to fabricate hybrid graphene/SWCNT films. We determined that the hybrid graphene/SWCNT film deposited on an ITO surface is the most effective heat transfer surface in pool boiling because of the interconnected network of carbon structures.

  19. Growth of Ge films by cluster beam deposition

    CERN Document Server

    Xu, J L; Feng, J Y

    2002-01-01

    Ge epitaxial layers with reasonable quality were grown on the Si(1 1 1) substrates by cluster beam deposition (CBD) process. The growth temperature plays a dominant role in the epitaxial growth of Ge films. The substrate temperature for epitaxial growth is about 500 deg. C, which is lower than the reported critical temperature of Ge epitaxial growth by MBE and CVD. A stress induced phase transition of Ge lattice from cubic to tetragonal is also observed in the CBD process, and the mechanism is discussed.

  20. Mobility activation in thermally deposited CdSe thin films

    Indian Academy of Sciences (India)

    Kangkan Sarmah; Ranjan Sarma

    2009-08-01

    Effect of illumination on mobility has been studied from the photocurrent decay characteristics of thermally evaporated CdSe thin films deposited on suitably cleaned glass substrate held at elevated substrate temperatures. The study indicates that the mobilities of the carriers of different trap levels are activated due to the energy of incident illumination, which results in the existence of two distinct trap levels. In each trap depth the energy of the trap increases linearly. It infers that there is a linear distribution of traps of different energies below the conduction band.

  1. Competing magnetic anisotropies in obliquely deposited thin permalloy film

    Energy Technology Data Exchange (ETDEWEB)

    Belyaev, B.A. [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation); Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, 50/38, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Reshetnev Siberian State Aerospace University, 31, pr. Imeni Gazety “Krasnoyarskii Rabochii”, Krasnoyarsk 660014 (Russian Federation); Izotov, A.V. [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation); Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, 50/38, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Solovev, P.N., E-mail: platon.solovev@gmail.com [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation)

    2016-01-15

    Distribution of the magnetic anisotropy in thin film prepared by thermal vacuum oblique deposition of permalloy with small off-normal angle of incident in the presence of an external magnetic field has been studied by ferromagnetic resonance technique. On local area of the sample, a mutual compensation of near orthogonal in-plane uniaxial magnetic anisotropies induced by oblique deposition and by applied magnetic field has been found. Moreover, in addition to the uniaxial (twofold) magnetic anisotropy, fourfold and sixfold magnetic anisotropies have been observed in the sample. To explain the obtained high-order anisotropies, we assumed that the sample has exchange coupled adjacent regions or phases with different parameters of magnetic anisotropy. The results of the micromagnetic analysis of a two-layer model of the sample confirm the hypothesis.

  2. Interface Study of ITO/ZnO and ITO/SnO2 Complex Transparent Conductive Layers and Their Effect on CdTe Solar Cells

    Directory of Open Access Journals (Sweden)

    Tingliang Liu

    2013-01-01

    Full Text Available Transparent ITO/ZnO and ITO/SnO2 complex conductive layers were prepared by DC- and RF-magnetron sputtering. Their structure and optical and electronic performances were studied by XRD, UV/Vis Spectroscopy, and four-probe technology. The interface characteristic and band offset of the ITO/ZnO, ITO/SnO2, and ITO/CdS were investigated by Ultraviolet Photoelectron Spectroscopy (UPS and X-ray Photoelectron Spectroscopy (XPS, and the energy band diagrams have also been determined. The results show that ITO/ZnO and ITO/SnO2 films have good optical and electrical properties. The energy barrier those at the interface of ITO/ZnO and ITO/SnO2 layers are almost 0.4 and 0.44 eV, which are lower than in ITO/CdS heterojunctions (0.9 eV, which is beneficial for the transfer and collection of electrons in CdTe solar cells and reduces the minority carrier recombination at the interface, compared to CdS/ITO. The effects of their use in CdTe solar cells were studied by AMPS-1D software simulation using experiment values obtained from ZnO, ITO, and SnO2. From the simulation, we confirmed the increase of Eff, FF, Voc, and Isc by the introduction of ITO/ZnO and ITO/SnO2 layers in CdTe solar cells.

  3. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.

    Science.gov (United States)

    Yan, Baojun; Liu, Shulin; Heng, Yuekun

    2015-01-01

    Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO:Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO:Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.

  4. Reaction network analysis for thin film deposition processes

    Science.gov (United States)

    Ramakrishnasubramanian, Krishnaprasath

    Understanding the growth of thin films produced by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) has been one of the most important challenge for surface chemists over the last two to three decades. There has been a lack of complete understanding of the surface chemistry behind these systems due to the dearth of experimental reaction kinetics data available. The data that do exist are generally derived through quantum computations. Thus, it becomes ever so important to develop a deposition model which not only predicts the bulk film chemistry but also explains its self-limiting nature and growth surface stability without the use of reaction rate data. The reaction network analysis tools developed in this thesis are based on a reaction factorization approach that aims to decouple the reaction rates by accounting for the chemical species surface balance dynamic equations. This process eliminates the redundant dynamic modes and identifies conserved modes as reaction invariants. The analysis of these invariants is carried out using a Species-Reaction (S-R) graph approach which also serves to simplify the representation of the complex reaction network. The S-R graph is self explanatory and consistent for all systems. The invariants can be easily extracted from the S-R graph by following a set of straightforward rules and this is demonstrated for the CVD of gallium nitride and the ALD of gallium arsenide. We propose that understanding invariants through these S-R graphs not only provides us with the physical significance of conserved modes but also give us a better insight into the deposition mechanism.

  5. Mechanical Properties and Thermal Stability of TiN/Ta Multilayer Film Deposited by Ion Beam Assisted Deposition

    Directory of Open Access Journals (Sweden)

    Hongfei Shang

    2014-01-01

    Full Text Available TiN/Ta multilayer film with a modulation period of 5.6 nm and modulation ratio of 1 : 1 was produced by ion beam assisted deposition. Microstructure of the as-deposited TiN/Ta multilayer film was observed by transmission electron microscopy and mechanical properties were investigated. Residual stress in the TiN/Ta multilayer film was about 72% of that of a TiN monolayer film with equivalent thickness deposited under the same conditions. Partial residual stress was released in the Ta sublayers during deposition, which led to the decrease of the residual stress of the TiN/Ta multilayer film. Nanohardness (H of the TiN/Ta multilayer film was 24 GPa, 14% higher than that of the TiN monolayer film. It is suggested that the increase of the nanohardness is due to the introduction of the Ta layers which restrained the growth of TiN crystal and led to the decrease of the grain size. A significant increase (3.5 times of the H3/E2 (E elastic modulus value indicated that the TiN/Ta multilayer film has higher elasticity than the TiN monolayer film. The Lc (critical load in nano-scratch test value of the TiN monolayer film was 45 mN, which was far lower than that of the TiN/Ta multilayer film (around 75 mN. Results of the indentation test showed a higher fracture toughness of the TiN/Ta multilayer film than that of the TiN monolayer film. Results of differential scanning calorimetric (DSC and thermo gravimetric analysis (TGA indicate that the TiN/Ta multilayer film has better thermal stability than the TiN monolayer film.

  6. Photosynthetic reaction centers/ITO hybrid nanostructure

    Energy Technology Data Exchange (ETDEWEB)

    Szabo, Tibor [Department of Medical Physics and Informatics, University of Szeged, Szeged (Hungary); Bencsik, Gabor [Department of Physical Chemistry and Materials Science, University of Szeged, Szeged (Hungary); Magyar, Melinda [Department of Medical Physics and Informatics, University of Szeged, Szeged (Hungary); Visy, Csaba [Department of Physical Chemistry and Materials Science, University of Szeged, Szeged (Hungary); Gingl, Zoltan [Department of Technical Informatics, University of Szeged, Szeged (Hungary); Nagy, Krisztina; Varo, Gyoergy [Institute of Biophysics, Hungarian Academy of Sciences, Biological Research Center, Szeged (Hungary); Hajdu, Kata; Kozak, Gabor [Department of Medical Physics and Informatics, University of Szeged, Szeged (Hungary); Nagy, Laszlo, E-mail: lnagy@sol.cc.u-szeged.hu [Department of Medical Physics and Informatics, University of Szeged, Szeged (Hungary)

    2013-03-01

    Photosynthetic reaction center proteins purified from Rhodobacter sphaeroides purple bacterium were deposited on the surface of indium tin oxide (ITO), a transparent conductive oxide, and the photochemical/-physical properties of the composite were investigated. The kinetics of the light induced absorption change indicated that the RC was active in the composite and there was an interaction between the protein cofactors and the ITO. The electrochromic response of the bacteriopheophytine absorption at 771 nm showed an increased electric field perturbation around this chromophore on the surface of ITO compared to the one measured in solution. This absorption change is associated with the charge-compensating relaxation events inside the protein. Similar life time, but smaller magnitude of this absorption change was measured on the surface of borosilicate glass. The light induced change in the conductivity of the composite as a function of the concentration showed the typical sigmoid saturation characteristics unlike if the photochemically inactive chlorophyll was layered on the ITO. In this later case the light induced change in the conductivity was oppositely proportional to the chlorophyll concentration due to the thermal dissipation of the excitation energy. The sensitivity of the measurement is very high; few picomole RC can change the light induced resistance of the composite. - Highlights: Black-Right-Pointing-Pointer Photosynthetic reaction center/ITO nanocomposite has been fabricated. Black-Right-Pointing-Pointer The composite showed photochemical/-physical activity with very high sensitivity. Black-Right-Pointing-Pointer This new type of material can be a good model of optoelectronic devices.

  7. Atomic layer deposition of copper sulfide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Schneider, Nathanaelle, E-mail: n.schneider@chimie-paristech.fr; Lincot, Daniel; Donsanti, Frédérique

    2016-02-01

    Atomic Layer Deposition (ALD) of copper sulfide (Cu{sub x}S) thin films from Cu(acac){sub 2} (acac = acetylacetonate = 2,4-pentanedionate) and H{sub 2}S as Cu and S precursors is reported. Typical self-saturated reactions (“ALD window”) are obtained in the temperature range T{sub dep} = 130–200 °C for an average growth per cycle (GR) = 0.25 Å/cycle. The morphology, crystallographic structure, chemical composition, electrical properties and optical band gap of thin films were investigated using scanning electronic microscopy (SEM), X-ray diffraction under Grazing Incidence conditions (GI-XRD), X-ray reflectivity (XRR), energy dispersive spectrometry (EDS), Hall effect measurements, and UV–vis spectroscopy. The obtained copper sulfide films are heavily p-doped (charge carrier concentration ~ 10{sup 21} –10{sup 22} cm{sup −3}) with optical band gaps in the range of 2.2–2.5 eV for direct and 1.6–1.8 eV for indirect band gaps. Depending on the number of ALD cycles, multiphase compounds (made of digenite Cu{sub 1.8}S, chalcocite Cu{sub 2}S, djurleite Cu{sub 31}S{sub 16} and covellite CuS) or single-phase digenite Cu{sub 1.8}S films are obtained via a growth mechanism that involves in-situ copper reduction and loss of sulfur by evaporation. - Highlights: • Cu{sub x}S films were synthesized by atomic layer deposition from Cu(acac){sub 2} and H{sub 2}S. • Self-saturated reactions at T{sub dep} = 130–200 °C for growth = 0.25 Å/cycle • Multi- or single- phase films are obtained depending on the number of cycles. • Growth mechanism involves copper reduction and loss of sulfur by evaporation.

  8. Improved conductivity of indium-tin-oxide film through the introduction of intermediate layer

    Science.gov (United States)

    Ng, S. W.; Yam, F. K.; Beh, K. P.; Tneh, S. S.; Hassan, Z.

    2016-09-01

    A thin intermediate layer (Ag, AuSn, In, Ni, Sn, SiO2) was individually deposited on glass substrates prior to the deposition of indium-tin-oxide (ITO) thin film by radio-frequency (RF) magnetron sputtering employing ITO target (composition ratio of In2O3:SnO2 = 9:1). The structural, optical and electrical properties were investigated to compare the ITO thin film with and without an intermediate layer. The preferential orientation of all ITO films was along (222) plane. Although all thin films were polycrystalline, the presence of intermediate layer promoted the overall crystallinity. The sheet resistance and resistivity of the ITO film were reduced from ∼68 Ω/□ to ∼29-45 Ω/□, and 16.2 × 10-4 Ω cm up to 7.58 × 10-4 Ω cm, respectively, by inserting a thin metal layer underneath the ITO film, and it is dependent on the degree of crystallization. The optical transmittance in the visible region varies from 40 to 88% for different samples. Based on the evaluation from Tauc plot, the optical band gap falls in the range of 4.02-4.12 eV. Physical film thickness was compared with that evaluated by optical measurement in the visible range and the physical thickness was found to be smaller. Similarly, the carrier concentration/scattering time from Hall effect measurement were also compared with that from optical measurement in the infrared region. Haacke's figure of merit (FOM) was employed to assess the quality of the ITO films, and the highest FOM is credited to ITO/In up to ∼8 × 10-3 Ω-1 in the visible light region.

  9. Investigation of polycrystalline CdTe thin films deposited by physical vapor deposition, close-spaced sublimation, and sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H.R.; Hasoon, F.S.; Abulfotuh, F.; Kazmerski, L.L. [National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)

    1995-11-01

    CdTe thin films, deposited on different substrate structures by physical vapor deposition, sputtering, and close-spaced sublimation, have been treated with CdCl{sub 2} at several temperatures. The morphology of the films has been studied by atomic force microscopy, and the observations were correlated to results obtained from x-ray diffraction, cathodoluminescence, and minority-carrier lifetime measurements. The samples treated at 400 {degree}C resulted in the best device-quality films, independent of deposition method and underlying substrate structure. For the first time, a nanograin structure was observed in CdTe sputtered samples. copyright {ital 1995} {ital American} {ital Vacuum} {ital Society}.

  10. High quality plasma-enhanced chemical vapor deposited silicon nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Cotler, T.J.; Chapple-Sokol, J. (IBM General Technology Division, Hopewell Junction, NY (United States))

    1993-07-01

    The qualities of plasma-enhanced chemical vapor deposited (PECVD) silicon nitride films can be improved by increasing the deposition temperature. This report compares PECVD silicon nitride films to low pressure chemical vapor deposited (LPCVD) films. The dependence of the film properties on process parameters, specifically power and temperature, are investigated. The stress is shown to shift from tensile to compressive with increasing temperature and power. The deposition rate, uniformity, wet etch rate, index of refraction, composition, stress, hydrogen content, and conformality are considered to evaluate the film properties. Temperature affects the hydrogen content in the films by causing decreased incorporation of N-H containing species whereas the dependence on power is due to changes in the gas-phase precursors. All PECVD film properties, with the exception of conformality, are comparable to those of LPCVD films.

  11. Slightly Conductive Transparent Films for Space Applications: Manufacturability and Durability

    Science.gov (United States)

    Uppala, N.; Griffin, J.; Vemulapalli, J.; Hambourger, P. D.

    2001-01-01

    Highly transparent, slightly conductive films of co-deposited indium tin oxide (ITO) and MgF, have possible applications for environmental protection of exterior surfaces of spacecraft. Reliable preparation of films with the desired sheet resistivity (approximately 10(exp 8) ohms/square) is difficult because the electrical properties of ITO-Mg F, are highly dependent on film composition. We have investigated the use of plasma emission monitoring to improve the reproducibility of films prepared by RF magnetron sputtering. While considerable improve ment was observed, it appears that some in-situ electrical or optica l characterization will be needed for reliable production coating wit h ITO-MgF,. We have also done further evaluation of a possibly undesi rable photoconductive effect previously observed in these films.

  12. Influence of deposition parameters on the properties of CdTe films deposited by close spaced sublimation

    OpenAIRE

    Falcão Vivienne Denise; Pinheiro Wagner Anacleto; Ferreira Carlos Luiz; Cruz Leila Rosa de Oliveira

    2006-01-01

    CdTe thin films are used as absorber layer in CdS/CdTe solar cells. The microstructure of this absorber layer plays a fundamental role in photovoltaic conversion and can be controlled by the deposition parameters used during the film growth. In this work, CdTe thin films were deposited by the CSS method onto glass substrates previously covered with In2O3:Sn. The effects of pressure, source temperature and substrate temperature on the microstructural properties of the films were studied. The p...

  13. Morphology and structural studies of WO3 films deposited on SrTiO3 by pulsed laser deposition

    Science.gov (United States)

    Kalhori, Hossein; Porter, Stephen B.; Esmaeily, Amir Sajjad; Coey, Michael; Ranjbar, Mehdi; Salamati, Hadi

    2016-12-01

    WO3 films have been grown by pulsed laser deposition on SrTiO3 (001) substrates. The effects of substrate temperature, oxygen partial pressure and energy fluence of the laser beam on the physical properties of the films were studied. Reflection high-energy electron diffraction (RHEED) patterns during and after growth were used to determine the surface structure and morphology. The chemical composition and crystalline phases were obtained by XPS and XRD respectively. AFM results showed that the roughness and skewness of the films depend on the substrate temperature during deposition. Optimal conditions were determined for the growth of the highly oriented films.

  14. Piezoelectric film electro-deposition for optical fiber sensor with ZnO coating

    Institute of Scientific and Technical Information of China (English)

    Li Zhou; Ping Gu; Ya Zhou

    2008-01-01

    The piezoelectric film electro-deposition for optical fiber sensor with ZnO coating is studied. The zinc oxide plating film is made on the copper surface directly by cathodic electro-deposition in the Zn(NO3)2 single salt aqueous solution systems. The influences of main experimental conditions on the properties of ZnO thin film in the electro-deposition processes are analyzed and a stable, practical and economic technique is obtained.

  15. Characteristics of TiO2/ZnO bilayer film towards pH sensitivity prepared by different spin coating deposition process

    Science.gov (United States)

    Rahman, Rohanieza Abdul; Zulkefle, Muhammad Al Hadi; Abdullah, Wan Fazlida Hanim; Rusop, M.; Herman, Sukreen Hana

    2016-07-01

    In this study, titanium dioxide (TiO2) and zinc oxide (ZnO) bilayer film for pH sensing application will be presented. TiO2/ZnO bilayer film with different speed of spin-coating process was deposited on Indium Tin Oxide (ITO), prepared by sol-gel method. This fabricated bilayer film was used as sensing membrane for Extended Gate Field-Effect Transistor (EGFET) for pH sensing application. Experimental results indicated that the sensor is able to detect the sensitivity towards pH buffer solution. In order to obtained the result, sensitivity measurement was done by using the EGFET setup equipment with constant-current (100 µA) and constant-voltage (0.3 V) biasing interfacing circuit. TiO2/ZnO bilayer film which the working electrode, act as the pH-sensitive membrane was connected to a commercial metal-oxide semiconductor FET (MOSFET). This MOSFET then was connected to the interfacing circuit. The sensitivity of the TiO2 thin film towards pH buffer solution was measured by dipping the sensing membrane in pH4, pH7 and pH10 buffer solution. These thin films were characterized by using Field Emission Scanning Electron Microscope (FESEM) to obtain the surface morphology of the composite bilayer films. In addition, I-V measurement was done in order to determine the electrical properties of the bilayer films. According to the result obtained in this experiment, bilayer film that spin at 4000 rpm, gave highest sensitivity which is 52.1 mV/pH. Relating the I-V characteristic of the thin films and sensitivity, the sensing membrane with higher conductivity gave better sensitivity.

  16. Ion beam sputter deposition of Ge films: Influence of process parameters on film properties

    Energy Technology Data Exchange (ETDEWEB)

    Bundesmann, C., E-mail: carsten.bundesmann@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Feder, R. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Wunderlich, R.; Teschner, U.; Grundmann, M. [Universität Leipzig, Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig (Germany); Neumann, H. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany)

    2015-08-31

    Several sets of Ge films were grown by ion beam sputter deposition under systematic variation of ion beam parameters (ion species and ion energy) and geometrical parameters (ion incidence angle and polar emission angle). The films were characterized concerning thickness, growth rate, mass density, structural properties and composition. The film thicknesses show a cosine-like angular distribution, and the growth rates were found to increase with increasing ion incidence angle and ion energy. All films are amorphous and the average mass density was found to be (4.3 ± 0.2) g/cm{sup 3}, without a systematic relation to ion energy and geometrical parameters. Slightly higher mass densities were found for Ge films grown by sputtering with Xe than for sputtering with Ar. The Ge films contain a fraction of inert gas atoms from backscattered primary particles. This fraction is found to be higher for sputtering with Ar than for sputtering with Xe. The fraction of inert gas atoms increases with increasing polar emission angle and increasing ion incidence angle. Raman scattering experiments revealed also systematic shifts of the characteristic Raman mode. The shifts are tentatively assigned to the change of the Ge particle densities caused by the incorporation of inert gas particles. There seem to be also slight changes in short range ordering. The experimental data are discussed with respect to the known energy and angular distributions of the sputtered and backscattered particles. - Highlights: • Ion beam sputter deposition under systematic variation of process parameters • Thickness, growth rate, mass density, composition, structure, phonon properties • All germanium films are amorphous with small variations in mass density. • Incorporation of considerable amount of inert process gas • Vibrational properties correlate with composition.

  17. Pulsed laser deposition growth of FeSb2 films for thermoelectric applications

    DEFF Research Database (Denmark)

    Sun, Ye; Canulescu, Stela; Sun, Peijie

    2011-01-01

    FeSb2 films were produced in a low-pressure Ar environment by pulsed laser deposition at 355 nm. The influence of growth parameters such as substrate temperature, Ar pressure and deposition time on the growth of FeSb2 films was studied. Nearly phase-pure FeSb2 films with thicknesses of 100–400 nm...... properties of FeSb2 films if they are to eventually reach thermoelectric applications at cryogenic temperatures....

  18. Characterisation of Pb thin films prepared by the nanosecond pulsed laser deposition technique for photocathode application

    OpenAIRE

    Lorusso, Antonella; Gontad, F.; Broitman, Esteban; Chiadroni, E.; Perrone, Walter

    2015-01-01

    Pb thin films were prepared by the nanosecond pulsed laser deposition technique on Si (100) and polycrystalline Nb substrates for photocathode application. As the photoemission performances of a cathode are strongly affected by its surface characteristics, the Pb films were grown at different substrate temperatures with the aim of modifying the morphology and structure of thin films. An evident morphological modification in the deposited films with the formation of spherical grains at higher ...

  19. XPS analysis and luminescence properties of thin films deposited by the pulsed laser deposition technique

    Science.gov (United States)

    Dolo, J. J.; Swart, H. C.; Coetsee, E.; Terblans, J. J.; Ntwaeaborwa, O. M.; Dejene, B. F.

    2010-04-01

    This paper presents the effect of substrate temperature and oxygen partial pressure on the photoluminescence (PL) intensity of the Gd2O2S:Tb3 + thin films that were grown by using pulsed laser deposition (PLD). The PL intensity increased with an increase in the oxygen partial pressure and substrate temperature. The thin film deposited at an oxygen pressure of 900 mTorr and substrate temperature of 900°C was found to be the best in terms of the PL intensity of the Gd2O2S:Tb3 + emission. The main emission peak due to the 5D4-7F5 transition of Tb was measured at a wavelength of 545 nm. The stability of these thin films under prolonged electron bombardment was tested with a combination of techniques such as X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and Cathodoluminescence (CL) spectroscopy. It was shown that the main reason for the degradation in luminescence intensity under electron bombardment is the formation of a non-luminescent Gd2O3 layer, with small amounts of Gd2S3, on the surface.

  20. Influence of deposition parameters on the properties of CdTe films deposited by close spaced sublimation

    Directory of Open Access Journals (Sweden)

    Vivienne Denise Falcão

    2006-03-01

    Full Text Available CdTe thin films are used as absorber layer in CdS/CdTe solar cells. The microstructure of this absorber layer plays a fundamental role in photovoltaic conversion and can be controlled by the deposition parameters used during the film growth. In this work, CdTe thin films were deposited by the CSS method onto glass substrates previously covered with In2O3:Sn. The effects of pressure, source temperature and substrate temperature on the microstructural properties of the films were studied. The properties were mainly influenced by the pressure, the presence of oxygen in the reaction chamber, and the substrate temperature. For films deposited under an argon atmosphere, an increase in grain size and a reduction of the texture were observed as the pressure and substrate temperature were increased. The introduction of oxygen in the atmosphere led to a decrease in the deposition rate and affected the microstructure and composition of the film. Films deposited under an argon-oxygen atmosphere have smaller grains than those deposited under argon and are richer in Te. The addition of oxygen to the atmosphere apparently did not result in the formation of oxides.

  1. Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition

    Science.gov (United States)

    Lee, Sang-hoon; Jung, Jae-soo; Lee, Sung-soo; Lee, Sung-bo; Hwang, Nong-moon

    2016-11-01

    For the applications such as flexible displays and solar cells, the direct deposition of crystalline silicon films on a flexible polymer substrate has been a great issue. Here, we investigated the direct deposition of polycrystalline silicon films on a polyimide film at the substrate temperature of 200 °C. The low temperature deposition of crystalline silicon on a flexible substrate has been successfully made based on two ideas. One is that the Si-Cl-H system has a retrograde solubility of silicon in the gas phase near the substrate temperature. The other is the new concept of non-classical crystallization, where films grow by the building block of nanoparticles formed in the gas phase during hot-wire chemical vapor deposition (HWCVD). The total amount of precipitation of silicon nanoparticles decreased with increasing HCl concentration. By adding HCl, the amount and the size of silicon nanoparticles were reduced remarkably, which is related with the low temperature deposition of silicon films of highly crystalline fraction with a very thin amorphous incubation layer. The dark conductivity of the intrinsic film prepared at the flow rate ratio of RHCl=[HCl]/[SiH4]=3.61 was 1.84×10-6 Scm-1 at room temperature. The Hall mobility of the n-type silicon film prepared at RHCl=3.61 was 5.72 cm2 V-1s-1. These electrical properties of silicon films are high enough and could be used in flexible electric devices.

  2. Pulsed Laser Deposition of Er doped tellurite films on large area

    Energy Technology Data Exchange (ETDEWEB)

    Bouazaoui, M [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Capoen, B [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Caricato, A P [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Chiasera, A [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Fazzi, A [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Ferrari, M [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Leggieri, G [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Martino, M [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Mattarelli, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Montagna, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Romano, F [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Tunno, T [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Turrel, S [Universite des Sciences et Technologies de Lille, Laboratoire de Spectrochimie Infrarouge et Raman, LASIR - UMR 8516 du CNRS - Bat C5 - 59655 - Villeneuve d' Ascq cedex (France); Vishnubhatla, K [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy)

    2007-04-15

    Thin films of Er{sup 3+}-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O{sub 2} pressure (5, 10 Pa) and at different substrate temperatures (RT, 100deg. C and 200deg. C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions.

  3. Harmonic generation in ZnO nanocrystalline laser deposited thin films

    Science.gov (United States)

    Narayanan, V.; Thareja, R. K.

    2006-04-01

    ZnO plasma produced by third harmonic 355 nm of Nd:YAG laser at various ambient pressures of oxygen was used for depositing quality nanocrystalline ZnO thin films. Time and space resolved optical emission spectroscopy is used to correlate the plasma properties with that of deposited thin films. The deposited films showed particle size of 8 and 84 nm at ambient oxygen pressure of 100 and 900 mTorr, respectively. Third harmonic generation observed in ZnO thin films deposited under 100 mTorr of ambient oxygen is reported.

  4. Thin-film preparation by back-surface irradiation pulsed laser deposition using metal powder targets

    Science.gov (United States)

    Kawasaki, Hiroharu; Ohshima, Tamiko; Yagyu, Yoshihito; Ihara, Takeshi; Yamauchi, Makiko; Suda, Yoshiaki

    2017-01-01

    Several kinds of functional thin films were deposited using a new thin-film preparation method named the back-surface irradiation pulsed laser deposition (BIPLD) method. In this BIPLD method, powder targets were used as the film source placed on a transparent target holder, and then a visible-wavelength pulsed laser was irradiated from the holder side to the substrate. Using this new method, titanium oxide and boron nitride thin films were deposited on the silicon substrate. Surface scanning electron microscopy (SEM) images suggest that all of the thin films were deposited on the substrate with some large droplets irrespective of the kind of target used. The deposition rate of the films prepared by using this method was calculated from film thickness and deposition time to be much lower than that of the films prepared by conventional PLD. X-ray diffraction (XRD) measurement results suggest that rutile and anatase TiO2 crystal peaks were formed for the films prepared using the TiO2 rutile powder target. Crystal peaks of hexagonal boron nitride were observed for the films prepared using the boron nitride powder target. The crystallinity of the prepared films was changed by annealing after deposition.

  5. Photoconductivity and photo-detecting properties of vacuum deposited ZnSe thin films

    Science.gov (United States)

    Gowrish Rao, K.; Bangera, Kasturi V.; Shivakumar, G. K.

    2011-11-01

    The paper reports the detailed analysis of photoconductivity and photo-detecting properties of vacuum deposited zinc selenide (ZnSe) thin films. The vacuum deposited ZnSe films were found to have high absorption coefficient and showed peak photo-response at 460 nm. The photocurrent and photo-response time of the films were measured as a function of substrate temperature and annealing conditions. Considerable increase in photocurrent and much faster photo-response was observed in films deposited at high substrate temperatures. Annealing at moderate temperatures also improved the photoconductivity and response time of the films.

  6. Development of vapor deposited thin films for bio-microsystems

    Science.gov (United States)

    Popat, Ketul Chandrakant

    Increasing demands for more biocompatible and sophisticated bio-microsystems in recent years has led to the development of a new technology called BioMEMS (biological micro-electro-mechanical systems). The foundation of this technology is the same as that of the traditional field of IC (integrated circuits), but an emphasis on developing new diagnostic and therapeutic modalities. Micro- and nano-fabrication techniques are currently being used to develop implants that can record, sense, stimulate and deliver to biological systems. Micromachined substrates can provide unique advantages over traditional implantable devices in terms of their ability to control surface micro-architecture, topography and feature size in micron and nano sizes. However, as BioMEMS technology is rapidly being developed, the practical use of these bio-microsystems is limited due to the inability to effectively interface with the biological system in non-immunogenic and stable manner. This is one of the most important considerations, and hence it is useful to focus on the fundamental scientific issues relating to material science, surface chemistry and immunology of silicon based bio-microsystems. This results in development of biomolecular interfaces that are compatible with both microfabrication processing and biological systems. The overall thrust of this research is to develop, characterize and integrate vapor deposited thin films with bio-microsystems in a manner that it is both reproducible and fully integrated with existing technologies. The main strategy is to use silane coatings precursor coatings on which poly (ethylene glycol) (PEG) will be coated in vapor phase. Silane has been coated user vapor phase, but its chemical and biological characterization and stability of the films under physiological conditions has not been investigated for biological applications. PEG has been coated in solution phase on silicon surface. However, it has not been coated under vapor phase. Here we are

  7. Properties of RF sputtered cadmium telluride (CdTe) thin films: Influence of deposition pressure

    Science.gov (United States)

    Kulkarni, R. R.; Pawbake, A. S.; Waykar, R. G.; Rondiya, S. R.; Jadhavar, A. A.; Pandharkar, S. M.; Karpe, S. D.; Diwate, K. D.; Jadkar, S. R.

    2016-04-01

    Influence of deposition pressure on structural, morphology, electrical and optical properties of CdTe thin films deposited at low substrate temperature (100°C) by RF magnetron sputtering was investigated. The formation of Cd