WorldWideScience

Sample records for csam metrology software

  1. CSAM Metrology Software Tool

    Science.gov (United States)

    Vu, Duc; Sandor, Michael; Agarwal, Shri

    2005-01-01

    CSAM Metrology Software Tool (CMeST) is a computer program for analysis of false-color CSAM images of plastic-encapsulated microcircuits. (CSAM signifies C-mode scanning acoustic microscopy.) The colors in the images indicate areas of delamination within the plastic packages. Heretofore, the images have been interpreted by human examiners. Hence, interpretations have not been entirely consistent and objective. CMeST processes the color information in image-data files to detect areas of delamination without incurring inconsistencies of subjective judgement. CMeST can be used to create a database of baseline images of packages acquired at given times for comparison with images of the same packages acquired at later times. Any area within an image can be selected for analysis, which can include examination of different delamination types by location. CMeST can also be used to perform statistical analyses of image data. Results of analyses are available in a spreadsheet format for further processing. The results can be exported to any data-base-processing software.

  2. [Metrological software of laser medical equipment].

    Science.gov (United States)

    Romashkov, A P; Glazov, A I; Tikhomirov, S V

    2001-01-01

    The paper considers the laser medical equipment situation that has established in Russia and that is characterized by the wide medical application of laser technologies and appropriate software and by inadequate development and imperfection of required metrological software and maintenance of laser equipment.

  3. Oscillator metrology with software defined radio

    CERN Document Server

    Sherman, Jeff A

    2016-01-01

    Analog electrical elements such as mixers, filters, transfer oscillators, isolating buffers, dividers, and even transmission lines contribute technical noise and unwanted environmental coupling in time and frequency measurements. Software defined radio (SDR) techniques replace many of these analog components with digital signal processing (DSP) on rapidly sampled signals. We demonstrate that, generically, commercially available multi-channel SDRs are capable of time and frequency metrology, outperforming purpose-built devices by as much as an order-of-magnitude. For example, for signals at 10 MHz and 6 GHz, we observe SDR time deviation noise floors of about 20 fs and 1 fs, respectively, in under 10 ms of averaging. Examining the other complex signal component, we find a relative amplitude measurement instability of 3e-7 at 5 MHz. We discuss the scalability of a SDR-based system for simultaneous measurement of many clocks. SDR's frequency agility allows for comparison of oscillators at widely different freque...

  4. Oscillator metrology with software defined radio.

    Science.gov (United States)

    Sherman, Jeff A; Jördens, Robert

    2016-05-01

    Analog electrical elements such as mixers, filters, transfer oscillators, isolating buffers, dividers, and even transmission lines contribute technical noise and unwanted environmental coupling in time and frequency measurements. Software defined radio (SDR) techniques replace many of these analog components with digital signal processing (DSP) on rapidly sampled signals. We demonstrate that, generically, commercially available multi-channel SDRs are capable of time and frequency metrology, outperforming purpose-built devices by as much as an order-of-magnitude. For example, for signals at 10 MHz and 6 GHz, we observe SDR time deviation noise floors of about 20 fs and 1 fs, respectively, in under 10 ms of averaging. Examining the other complex signal component, we find a relative amplitude measurement instability of 3 × 10(-7) at 5 MHz. We discuss the scalability of a SDR-based system for simultaneous measurement of many clocks. SDR's frequency agility allows for comparison of oscillators at widely different frequencies. We demonstrate a novel and extreme example with optical clock frequencies differing by many terahertz: using a femtosecond-laser frequency comb and SDR, we show femtosecond-level time comparisons of ultra-stable lasers with zero measurement dead-time.

  5. Citizen Science Air Monitor (CSAM) Operating Procedures

    Science.gov (United States)

    The Citizen Science Air Monitor (CSAM) is an air monitoring system designed for measuring nitrogen dioxide (NO2) and particulate matter (PM) pollutants simultaneously. This self-contained system consists of a CairPol CairClip NO2 sensor, a Thermo Scientific personal DataRAM PM2.5...

  6. NIF Large Optics Metrology Software: Description and Algorithms

    Energy Technology Data Exchange (ETDEWEB)

    Williams, W H

    2002-10-15

    Several software packages have been developed for use by NIF large optics vendors during production of NIF optics. These packages allow specific comparison of the interferometer measurements done on optics against the wavefront requirements for those optics, as given on relevant drawings. This document outlines the various packages, and their specific applications, and describes in some detail the calculational algorithms used. It is intended as the primary reference document for the codes (aside from the source codes themselves). In order to ensure good laser beam quality, NIF requires that all large optics be measured with an interferometer to monitor how that optic will affect beam wavefront quality and focusability. Various specifications for transmitted wavefront (TWF) and reflected wavefront (RWF) for the full-aperture parts, and for various sub-apertures, are given on the large optics drawings. For reference, a summary of the various specifications for the NIF large optics is given in Figure 1. Each large optic in production will be measured against some of these specifications. Other specifications will be monitored in a 'process validation' fashion by measuring a representative sample of parts to assure the process is yielding parts which pass specification. This document will focus on the specifications requiring measurements on every part. This document will not go into detail concerning the procedures and limitations of the measurements themselves.

  7. Injection molding lens metrology using software configurable optical test system

    Science.gov (United States)

    Zhan, Cheng; Cheng, Dewen; Wang, Shanshan; Wang, Yongtian

    2016-10-01

    Optical plastic lens produced by injection molding machine possesses numerous advantages of light quality, impact resistance, low cost, etc. The measuring methods in the optical shop are mainly interferometry, profile meter. However, these instruments are not only expensive, but also difficult to alignment. The software configurable optical test system (SCOTS) is based on the geometry of the fringe refection and phase measuring deflectometry method (PMD), which can be used to measure large diameter mirror, aspheric and freeform surface rapidly, robustly, and accurately. In addition to the conventional phase shifting method, we propose another data collection method called as dots matrix projection. We also use the Zernike polynomials to correct the camera distortion. This polynomials fitting mapping distortion method has not only simple operation, but also high conversion precision. We simulate this test system to measure the concave surface using CODE V and MATLAB. The simulation results show that the dots matrix projection method has high accuracy and SCOTS has important significance for on-line detection in optical shop.

  8. Computational Science Applications in Manufacturing (CSAM) workshop evaluation report

    Energy Technology Data Exchange (ETDEWEB)

    Bradford, J.; Dixon, L.; Rutherford, W.

    1994-09-01

    The Computational Science Applications in Manufacturing (CSAM) workshop is a program designed to expose and train high school students in the techniques used in computational science as they pertain to manufacturing. This effort was sponsored by the AlliedSignal Inc., Kansas City Division (KCD) in cooperation with the Department of Energy (DOE) and their initiative to support education with respect to the advances in technology.

  9. The coming of age of the first hybrid metrology software platform dedicated to nanotechnologies (Conference Presentation)

    Science.gov (United States)

    Foucher, Johann; Labrosse, Aurelien; Dervillé, Alexandre; Zimmermann, Yann; Bernard, Guilhem; Martinez, Sergio; Grönqvist, Hanna; Baderot, Julien; Pinzan, Florian

    2017-03-01

    The development and integration of new materials and structures at the nanoscale require multiple parallel characterizations in order to control mostly physico-chemical properties as a function of applications. Among all properties, we can list physical properties such as: size, shape, specific surface area, aspect ratio, agglomeration/aggregation state, size distribution, surface morphology/topography, structure (including crystallinity and defect structure), solubility and chemical properties such as: structural formula/molecular structure, composition (including degree of purity, known impurities or additives), phase identity, surface chemistry (composition, charge, tension, reactive sites, physical structure, photocatalytic properties, zeta potential), hydrophilicity/lipophilicity. Depending on the final material formulation (aerosol, powder, nanostructuration…) and the industrial application (semiconductor, cosmetics, chemistry, automotive…), a fleet of complementary characterization equipments must be used in synergy for accurate process tuning and high production yield. The synergy between equipment so-called hybrid metrology consists in using the strength of each technique in order to reduce the global uncertainty for better and faster process control. The only way to succeed doing this exercise is to use data fusion methodology. In this paper, we will introduce the work that has been done to create the first generic hybrid metrology software platform dedicated to nanotechnologies process control. The first part will be dedicated to process flow modeling that is related to a fleet of metrology tools. The second part will introduce the concept of entity model which describes the various parameters that have to be extracted. The entity model is fed with data analysis as a function of the application (automatic analysis or semi-automated analysis). The final part will introduce two ways of doing data fusion on real data coming from imaging (SEM, TEM, AFM

  10. The Performance of CSAM SAM when Cycle Length is extended

    Energy Technology Data Exchange (ETDEWEB)

    Roh, Kyung-ho; Moon, Sang-rae [KHNP, Daejeon (Korea, Republic of)

    2016-10-15

    In order to verify validation of that, CPC Axial Power Distribution is compared with Axial Power Distribution based on ICI every week. The difference between CPC Axial Power Distribution and Axial Power Distribution based on ICI increases according as fuels are burned. It is called CPC Axial Power Distribution Root Mean Square Error (CPC RMS Error). SAM and calibration of ex-core detector are important factors influencing the magnitude of the difference. According to vendor, the difference is limited by 8%. Otherwise, CPC penalty increases as many as difference increase. Therefore, KHNP developed Constrained Simulated Annealing Method (CSAM), which has better performance than that of Least Square Method (LSM), to calculate SAM constant. The CSA SAM contributed largely to maintain CPC operating margin. Somewhat, KHNP is developing the technology to be able to operate nuclear power plants for 24 month to optimize their efficiency. This paper shows trends of CPC RMS Error in a case of 24 months operation. Trends are based on data of a few OPR1000s under operation. It is data of OPR1000s that CSA SAM is applied. KHNP is developing the technology to extend operation cycle length in order to optimize the operation efficiency of OPR1000. To verify effect of extended operation cycle length on CPC, CPC Axial Power Distribution RMS Error in a case of 24 months operation was expected using operation data of six cycles in OPR1000. In cases that CPC Axial Power Distribution RMS Error exceeds threshold, operation margin is decreased due to CPC penalty. To prevent CPC operation margin from being decreased, improved method to calculate SAM or to calibrate ex-core detector is required. KHNP will consider the way to maintain CPC operation margin along with 24 month operation technology development, hereafter.

  11. Advanced hardware and software methods for thread and gear dimensional metrology. CRADA final report

    Energy Technology Data Exchange (ETDEWEB)

    Miller, A.C. Jr.; Grann, E.B.

    1997-03-05

    The Oak Ridge Centers for Manufacturing Technology (ORCMT) and Apeiron Incorporated have collaborated on an effort to develop a frequency modulated continuous wave (FMCW) fiber lidar system for dimensional metrology of internal threads, gears, and splines. The purpose of this effort was to assist a small company in developing an instrument that would exceed the performance of competing foreign instruments and provide measurement capabilities necessary to assure compliance for NASA facilities and other industrial facilities. The two parties collaborated on design, assembly, and bench testing of the prototype instrument. The prototype system was targeted to have the capability of profiling internally machined gears and threads to an accuracy of less than a micron.

  12. Improvement of the software Bernese for SLR data processing in the Main Metrological Centre of the State Time and Frequency Service

    Science.gov (United States)

    Tsyba, E.; Kaufman, M.

    2015-08-01

    Preparatory works for resuming operational calculations of the Earth rotation parameters based on the results of satellite laser ranging data processing (LAGEOS 1, LAGEOS 2) are to be completed in the Main Metrology Centre Of The State Time And Frequency Service (VNIIFTRI) in 2014. For this purpose BERNESE 5.2 software (Dach & Walser, 2014) was chosen as a base software which has been used for many years in the Main Metrological Centre of the State Time and Frequency Service to process phase observations of GLONASS and GPS satellites. Although in the BERNESE 5.2 software announced presentation the possibility of the SLR data processing is declared, it has not been fully implemented. In particular there is no such an essential element as corrective action (as input or resulting parameters) in the local time scale ("time bias"), etc. Therefore, additional program blocks have been developed and integrated into the BERNESE 5.2 software environment. The program blocks are written in Perl and Matlab program languages and can be used both for Windows and Linux, 32-bit and 64-bit platforms.

  13. Dimensional Metrology for Microtechnology

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2005-01-01

    This ph. D. project was aimed at developing and validating techniques for dimensional metrology of: miniaturized items, microsystem components, and surfaces. In particular the study was focused on techniques based on: AFM-CMM integration and Scanning Electron Microscopy (SEM). Development...... was proposed and the principle demonstrated on software gauges. Simulations of Surface Mapping were done, based on the model developed. Direct performance verification of the Large Range AFM was eventually carried out, and lateral metrology was possible, in the millimeter range, with accuracy in the order...... at high magnifications was, proposed and this has resulted into a patent application. The final part of the thesis is devoted to applications of dimensional metrology to case studies. Three applications are presented, two of them are investigations of surface metrology, while the third is about extraction...

  14. Forensic-metrological considerations on assessment of compliance (or non-compliance) in forensic blood alcohol content determinations: A case study with software application.

    Science.gov (United States)

    Zamengo, Luca; Frison, Giampietro; Tedeschi, Gianpaola; Frasson, Samuela

    2016-08-01

    Blood alcohol concentration is the most frequent analytical determination carried out in forensic toxicology laboratories worldwide. It is usually required to assess if an offence has been committed by comparing blood alcohol levels with specified legal limits, which can vary widely among countries. Due to possible serious legal consequences associated with non-compliant alcohol levels, measurement uncertainty should be carefully evaluated, along with other metrological aspects which can influence the final result. The whole procedure can be time-consuming and error-generating in routine practice, increasing the risks for unreliable assessments. A software application named Ethanol WorkBook (EtWB) was developed at the author's laboratory by using Visual Basic for Application language and MS Excel(®), with the aim of providing help to forensic analysts involved in blood alcohol determinations. The program can (i) calculate measurement uncertainties and decision limits with different methodologies; (ii) assess compliance to specification limits with a guard-band approach; (iii) manage quality control (QC) data and create control charts for QC samples; (iv) create control maps from real cases data archives; (v) provide laboratory reports with graphical outputs for elaborated data and (vi) create comprehensive searchable case archives. A typical example of drink driving case is presented and discussed to illustrate the importance of a metrological approach for reliable compliance assessment and to demonstrate software application in routine practice. The tool is made freely available to the scientific community at request.

  15. Metrologically speaking

    Science.gov (United States)

    Hansen, Matthew E.

    2008-08-01

    Optical metrology is a science and an art. Education in the engineering disciplines concentrates on technical knowledge transfer. However, creativity and imagination are required in partnership with these technical skills to generate truly innovative results. This presentation investigates strategies and methodologies of working in which the exploration of potential solutions to optical metrology problems becomes more of a creative process than the strict application of technical know-how.

  16. Precision metrology.

    Science.gov (United States)

    Jiang, X; Whitehouse, D J

    2012-08-28

    This article is a summary of the Satellite Meeting, which followed on from the Discussion Meeting at the Royal Society on 'Ultra-precision engineering: from physics to manufacture', held at the Kavli Royal Society International Centre, Chicheley Hall, Buckinghamshire, UK. The meeting was restricted to 18 invited experts in various aspects of precision metrology from academics from the UK and Sweden, Government Institutes from the UK and Germany and global aerospace industries. It examined and identified metrology problem areas that are, or may be, limiting future developments in precision engineering and, in particular, metrology. The Satellite Meeting was intended to produce a vision that will inspire academia and industry to address the solutions of those open-ended problems identified. The discussion covered three areas, namely the function of engineering parts, their measurement and their manufacture, as well as their interactions.

  17. Temperature metrology

    Science.gov (United States)

    Fischer, J.; Fellmuth, B.

    2005-05-01

    The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

  18. FOREWORD: Materials metrology Materials metrology

    Science.gov (United States)

    Bennett, Seton; Valdés, Joaquin

    2010-04-01

    It seems that so much of modern life is defined by the materials we use. From aircraft to architecture, from cars to communications, from microelectronics to medicine, the development of new materials and the innovative application of existing ones have underpinned the technological advances that have transformed the way we live, work and play. Recognizing the need for a sound technical basis for drafting codes of practice and specifications for advanced materials, the governments of countries of the Economic Summit (G7) and the European Commission signed a Memorandum of Understanding in 1982 to establish the Versailles Project on Advanced Materials and Standards (VAMAS). This project supports international trade by enabling scientific collaboration as a precursor to the drafting of standards. The VAMAS participants recognized the importance of agreeing a reliable, universally accepted basis for the traceability of the measurements on which standards depend for their preparation and implementation. Seeing the need to involve the wider metrology community, VAMAS approached the Comité International des Poids et Mesures (CIPM). Following discussions with NMI Directors and a workshop at the BIPM in February 2005, the CIPM decided to establish an ad hoc Working Group on the metrology applicable to the measurement of material properties. The Working Group presented its conclusions to the CIPM in October 2007 and published its final report in 2008, leading to the signature of a Memorandum of Understanding between VAMAS and the BIPM. This MoU recognizes the work that is already going on in VAMAS as well as in the Consultative Committees of the CIPM and establishes a framework for an ongoing dialogue on issues of materials metrology. The question of what is meant by traceability in the metrology of the properties of materials is particularly vexed when the measurement results depend on a specified procedure. In these cases, confidence in results requires not only traceable

  19. Capability Handbook- offline metrology

    DEFF Research Database (Denmark)

    Islam, Aminul; Marhöfer, David Maximilian; Tosello, Guido

    This offline metrological capability handbook has been made in relation to HiMicro Task 3.3. The purpose of this document is to assess the metrological capability of the HiMicro partners and to gather the information of all available metrological instruments in the one single document. It provides...... a quick overview of what is possible today by the state of the art, what the HiMicro consortium can do and what metrological requirements we have concerning the HiMicro industrial demonstrators....

  20. Metrology and Energy Conservation

    Institute of Scientific and Technical Information of China (English)

    Xuan Xiang

    2006-01-01

    @@ May 20 is World Metrology Day and the theme of this year is "Metrology and Energy Conservation." Energy is not only a vital issue for China, but also for the world. In order to implement Proposal of the CPC Central Committee on the 11th Five-Year Program for National Economic and Social Development, the government bulletin of 5th Plenary Session of the 16th CPC Central Committee announced that "there shall be marked improvement on resource utilization; the energy consumption for unit GDP shall cut 20%, water consumption of unit industrial added value drop 30%... and the recycle ratio of industrial solid wastes shall raise by 60%." These are key targets of economic development during the 11th five-year program. To make full use of metrology for energy conservation and energy utilization, the competent metrology department of Chinese Goyernment advanced metrology program in light of China's energy status.

  1. Lithography, metrology and nanomanufacturing.

    Science.gov (United States)

    Liddle, J Alexander; Gallatin, Gregg M

    2011-07-01

    Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be perfect. Assuring perfection requires expensive metrology. Top of the line logic sells for several hundred thousand dollars per square metre and, even though the required metrology is expensive, it is a small percentage of the overall manufacturing cost. The level of stability and control afforded by current lithography tools means that much of this metrology can be online and statistical. In contrast, many of the novel types of nanomanufacturing currently being developed will produce products worth only a few dollars per square metre. To be cost effective, the required metrology must cost proportionately less. Fortunately many of these nanofabrication techniques, such as block copolymer self-assembly, colloidal self-assembly, DNA origami, roll-2-roll nano-imprint, etc., will not require the same level of perfection to meet specification. Given the variability of these self-assembly processes, in order to maintain process control, these techniques will require some level of real time online metrology. Hence we are led to the conclusion that future nanomanufacturing may well necessitate "cheap" nanometre scale metrology which functions real time and on-line, e.g. at GHz rates, in the production stream. In this paper we review top-down and bottom-up nanofabrication techniques and compare and contrast the various metrology requirements.

  2. Industrial graphene metrology.

    Science.gov (United States)

    Kyle, Jennifer Reiber; Ozkan, Cengiz S; Ozkan, Mihrimah

    2012-07-07

    Graphene is an allotrope of carbon whose structure is based on one-atom-thick planar sheets of carbon atoms that are densely packed in a honeycomb crystal lattice. Its unique electrical and optical properties raised worldwide interest towards the design and fabrication of future electronic and optical devices with unmatched performance. At the moment, extensive efforts are underway to evaluate the reliability and performance of a number of such devices. With the recent advances in synthesizing large-area graphene sheets, engineers have begun investigating viable methodologies for conducting graphene metrology and quality control at industrial scales to understand a variety of reliability issues including defects, patternability, electrical, and physical properties. This review summarizes the current state of industrial graphene metrology and provides an overview of graphene metrology techniques. In addition, a recently developed large-area graphene metrology technique based on fluorescence quenching is introduced. For each metrology technique, the industrial metrics it measures are identified--layer thickness, edge structure, defects, Fermi level, and thermal conductivity--and a detailed description is provided as to how the measurements are performed. Additionally, the potential advantages of each technique for industrial use are identified, including throughput, scalability, sensitivity to substrate/environment, and on their demonstrated ability to achieve quantified results. The recently developed fluorescence-quenching metrology technique is shown to meet all the necessary criteria for industrial applications, rendering it the first industry-ready graphene metrology technique.

  3. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Barnes, L.M.

    2003-11-12

    This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 8.4, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2000, and ANSI/NCSL Z540-1 (equivalent to ISO Guide 25). FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/ts/htdocs/210/214/scopes/2001080.pdf. These parameters are summarized in the table at the bottom of this introduction.

  4. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Dr. Glen E. Gronniger

    2007-10-02

    This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 13.2, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2005, and ANSI/NCSL Z540-1. FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/Standards/scopes/2001080.pdf. These parameters are summarized. The Honeywell Federal Manufacturing & Technologies (FM&T) Metrology Department has developed measurement technology and calibration capability in four major fields of measurement: (1) Mechanical; (2) Environmental, Gas, Liquid; (3) Electrical (DC, AC, RF/Microwave); and (4) Optical and Radiation. Metrology Engineering provides the expertise to develop measurement capabilities for virtually any type of measurement in the fields listed above. A strong audit function has been developed to provide a means to evaluate the calibration programs of our suppliers and internal calibration organizations. Evaluation includes measurement audits and technical surveys.

  5. A Century of Acoustic Metrology

    DEFF Research Database (Denmark)

    Rasmussen, Knud

    1998-01-01

    The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect.......The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect....

  6. Metrology of microcomponents and nanostructures

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2004-01-01

    OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004......OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004...

  7. Metrology of microcomponents and nanostructures

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2004-01-01

    OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004......OH presentation at Conference on "Optical Coordinate Metrology, 3D Digitisation and Reverse Engineering", DTU, 28. oktober 2004...

  8. Metrology Measurement Capabilities

    Energy Technology Data Exchange (ETDEWEB)

    Barnes, L.M.

    2000-03-23

    This document contains descriptions of Federal Manufacturing and Technologies (FM and T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties in laboratories that conform to the requirements of the Department of Energy Development and Production Manual Chapter 8.4, and ANSI/NCSL Z540-1 (equivalent to ISO Guide 25). FM and T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. These parameters are summarized.

  9. Optical imaging and metrology

    CERN Document Server

    Osten, Wolfgang

    2012-01-01

    A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.

  10. Metrology for drug delivery.

    Science.gov (United States)

    Lucas, Peter; Klein, Stephan

    2015-08-01

    In various recently published studies, it is argued that there are underestimated risks with infusion technology, i.e., adverse incidents believed to be caused by inadequate administration of the drugs. This is particularly the case for applications involving very low-flow rates, i.e., metrological infrastructure for low-flow rates. Technical challenges such as these were the reason a European research project "Metrology for Drug Delivery" was started in 2011. In this special issue of Biomedical Engineering, the results of that project are discussed.

  11. Overview of Mask Metrology

    Science.gov (United States)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  12. Process window metrology

    Science.gov (United States)

    Ausschnitt, Christopher P.; Chu, William; Hadel, Linda M.; Ho, Hok; Talvi, Peter

    2000-06-01

    This paper is the third of a series that defines a new approach to in-line lithography control. The first paper described the use of optically measurable line-shortening targets to enhance signal-to-noise and reduce measurement time. The second described the dual-tone optical critical dimension (OCD) measurement and analysis necessary to distinguish dose and defocus. Here we describe the marriage of dual-tone OCD to SEM-CD metrology that comprises what we call 'process window metrology' (PWM), the means to locate each measured site in dose and focus space relative to the allowed process window. PWM provides in-line process tracking and control essential to the successful implementation of low-k lithography.

  13. Metrology and Time

    CERN Document Server

    Rybak, B

    1999-01-01

    The algorithm Pi/sinx reveals an elliptic excess which acts as the real component (Space) inducing the imaginary component (Time). Key words : metrology, chronogenesis, tropic year, anomalistic year. ----- L 'algorithme Pi/sinx revele un excedent elliptique constituant la composante active d ' espace dont la composante reactive exprime la chronogenese tropique aussi bien qu ' anomalistique.. Mots-cles : metrologie, chronogenese, annee tropique, annee anomalistique

  14. Advanced Mathematical Tools in Metrology III

    Science.gov (United States)

    Ciarlini, P.

    The Table of Contents for the book is as follows: * Foreword * Invited Papers * The ISO Guide to the Expression of Uncertainty in Measurement: A Bridge between Statistics and Metrology * Bootstrap Algorithms and Applications * The TTRSs: 13 Oriented Constraints for Dimensioning, Tolerancing & Inspection * Graded Reference Data Sets and Performance Profiles for Testing Software Used in Metrology * Uncertainty in Chemical Measurement * Mathematical Methods for Data Analysis in Medical Applications * High-Dimensional Empirical Linear Prediction * Wavelet Methods in Signal Processing * Software Problems in Calibration Services: A Case Study * Robust Alternatives to Least Squares * Gaining Information from Biomagnetic Measurements * Full Papers * Increase of Information in the Course of Measurement * A Framework for Model Validation and Software Testing in Regression * Certification of Algorithms for Determination of Signal Extreme Values during Measurement * A Method for Evaluating Trends in Ozone-Concentration Data and Its Application to Data from the UK Rural Ozone Monitoring Network * Identification of Signal Components by Stochastic Modelling in Measurements of Evoked Magnetic Fields from Peripheral Nerves * High Precision 3D-Calibration of Cylindrical Standards * Magnetic Dipole Estimations for MCG-Data * Transfer Functions of Discrete Spline Filters * An Approximation Method for the Linearization of Tridimensional Metrology Problems * Regularization Algorithms for Image Reconstruction from Projections * Quality of Experimental Data in Hydrodynamic Research * Stochastic Drift Models for the Determination of Calibration Intervals * Short Communications * Projection Method for Lidar Measurement * Photon Flux Measurements by Regularised Solution of Integral Equations * Correct Solutions of Fit Problems in Different Experimental Situations * An Algorithm for the Nonlinear TLS Problem in Polynomial Fitting * Designing Axially Symmetric Electromechanical Systems of

  15. Laser Metrology in the Micro-Arcsecond Metrology Testbed

    Science.gov (United States)

    An, Xin; Marx, D.; Goullioud, Renaud; Zhao, Feng

    2004-01-01

    The Space Interferometer Mission (SIM), scheduled for launch in 2009, is a space-born visible light stellar interferometer capable of micro-arcsecond-level astrometry. The Micro-Arcsecond Metrology testbed (MAM) is the ground-based testbed that incorporates all the functionalities of SIM minus the telescope, for mission-enabling technology development and verification. MAM employs a laser heterodyne metrology system using the Sub-Aperture Vertex-to-Vertex (SAVV) concept. In this paper, we describe the development and modification of the SAVV metrology launchers and the metrology instrument electronics, precision alignments and pointing control, locating cyclic error sources in the MAM testbed and methods to mitigate the cyclic errors, as well as the performance under the MAM performance metrics.

  16. Advances in Quantum Metrology

    CERN Document Server

    Giovannetti, Vittorio; Maccone, Lorenzo

    2011-01-01

    In classical estimation theory, the central limit theorem implies that the statistical error in a measurement outcome can be reduced by an amount proportional to n^(-1/2) by repeating the measures n times and then averaging. Using quantum effects, such as entanglement, it is often possible to do better, decreasing the error by an amount proportional to 1/n. Quantum metrology is the study of those quantum techniques that allow one to gain advantages over purely classical approaches. In this review, we analyze some of the most promising recent developments in this research field. Specifically, we deal with the developments of the theory and point out some of the new experiments. Then we look at one of the main new trends of the field, the analysis of how the theory must take into account the presence of noise and experimental imperfections.

  17. Combining classical metrology models

    Directory of Open Access Journals (Sweden)

    Francisco Roldán

    2013-11-01

    Full Text Available The results obtained in the graphic analysis of the modulation of the Cuarto Real de Santo Domingo building in Granada, Spain, (ROLDÁN, 2011 have provided new insights to further approach the research on possible use the double-scale in historical monumental architecture. We propose the characterization of the singularities of the system, from the implications and graphic representation required by the metrological scheme identified, as well as the variety of typologies that are presented in their modular frames, and the iterative combination of two-scale modules which allow operational approximations to fractions and ratios not explicitly present in the system.

  18. Heterodyne Interferometer Angle Metrology

    Science.gov (United States)

    Hahn, Inseob; Weilert, Mark A.; Wang, Xu; Goullioud, Renaud

    2010-01-01

    A compact, high-resolution angle measurement instrument has been developed that is based on a heterodyne interferometer. The common-path heterodyne interferometer metrology is used to measure displacements of a reflective target surface. In the interferometer setup, an optical mask is used to sample the measurement laser beam reflecting back from a target surface. Angular rotations, around two orthogonal axes in a plane perpendicular to the measurement- beam propagation direction, are determined simultaneously from the relative displacement measurement of the target surface. The device is used in a tracking telescope system where pitch and yaw measurements of a flat mirror were simultaneously performed with a sensitivity of 0.1 nrad, per second, and a measuring range of 0.15 mrad at a working distance of an order of a meter. The nonlinearity of the device is also measured less than one percent over the measurement range.

  19. Metrology with Unknown Detectors.

    Science.gov (United States)

    Altorio, Matteo; Genoni, Marco G; Somma, Fabrizia; Barbieri, Marco

    2016-03-11

    The best possible precision is one of the key figures in metrology, but this is established by the exact response of the detection apparatus, which is often unknown. There exist techniques for detector characterization that have been introduced in the context of quantum technologies but apply as well for ordinary classical coherence; these techniques, though, rely on intense data processing. Here, we show that one can make use of the simpler approach of data fitting patterns in order to obtain an estimate of the Cramér-Rao bound allowed by an unknown detector, and we present applications in polarimetry. Further, we show how this formalism provides a useful calculation tool in an estimation problem involving a continuous-variable quantum state, i.e., a quantum harmonic oscillator.

  20. Metrology with Unknown Detectors

    CERN Document Server

    Altorio, Matteo; Somma, Fabrizia; Barbieri, Marco

    2015-01-01

    The best possible precision is one of the key figures in metrology, but this is established by the exact response of the detection apparatus, which is often unknown. There exist techniques for detector characterisation, that have been introduced in the context of quantum technologies, but apply as well for ordinary classical coherence; these techniques, though, rely on intense data processing. Here we show that one can make use of the simpler approach of data fitting patterns in order to obtain an estimate of the Cram\\'er-Rao bound allowed by an unknown detector, and present applications in polarimetry. Further, we show how this formalism provide a useful calculation tool in an estimation problem involving a continuous-variable quantum state, i.e. a quantum harmonic oscillator.

  1. Talking about Metrology and Energy On World Metrology Day

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    @@ The theme of this year's World Metrology Day is "Metrology and Energy". The energy problem is an important issue for the whole world and has received great attention in China since China is both a big energy-consuming country and a country severely short of energy.Under the energy and environmental pressure, China will take measures in the following four respects in order to solve the problem of energy shortage:

  2. Fundamental units: physics and metrology

    CERN Document Server

    Okun, Lev Borisovich

    2003-01-01

    The problem of fundamental units is discussed in the context of achievements of both theoretical physics and modern metrology. On one hand, due to fascinating accuracy of atomic clocks, the traditional macroscopic standards of metrology (second, metre, kilogram) are giving way to standards based on fundamental units of nature: velocity of light $c$ and quantum of action $h$. On the other hand, the poor precision of gravitational constant $G$, which is widely believed to define the ``cube of theories'' and the units of the future ``theory of everything'', does not allow to use $G$ as a fundamental dimensional constant in metrology. The electromagnetic units in SI are actually based on concepts of prerelativistic classical electrodynamics such as ether, electric permitivity and magnetic permeability of vacuum. Concluding remarks are devoted to terminological confusion which accompanies the progress in basic physics and metrology.

  3. Color and appearance metrology facility

    Data.gov (United States)

    Federal Laboratory Consortium — The NIST Physical Measurement Laboratory has established the color and appearance metrology facility to support calibration services for 0°/45° colored samples, 20°,...

  4. Metrology of IXO Mirror Segments

    Science.gov (United States)

    Chan, Kai-Wing

    2011-01-01

    For future x-ray astrophysics mission that demands optics with large throughput and excellent angular resolution, many telescope concepts build around assembling thin mirror segments in a Wolter I geometry, such as that originally proposed for the International X-ray Observatory. The arc-second resolution requirement posts unique challenges not just for fabrication, mounting but also for metrology of these mirror segments. In this paper, we shall discuss the metrology of these segments using normal incidence metrological method with interferometers and null lenses. We present results of the calibration of the metrology systems we are currently using, discuss their accuracy and address the precision in measuring near-cylindrical mirror segments and the stability of the measurements.

  5. Computed tomography for dimensional metrology

    DEFF Research Database (Denmark)

    Kruth, J.P.; Bartscher, M.; Carmignato, S.;

    2011-01-01

    metrology, putting emphasis on issues as accuracy, traceability to the unit of length (the meter) and measurement uncertainty. It provides a state of the art (anno 2011) and application examples, showing the aptitude of CT metrology to: (i) check internal dimensions that cannot be measured using traditional...... coordinate measuring machines and (ii) combine dimensional quality control with material quality control in one single quality inspection run....

  6. 5th Conference on Advanced Mathematical and Computational Tools in Metrology

    CERN Document Server

    Cox, M G; Filipe, E; Pavese, F; Richter, D

    2001-01-01

    Advances in metrology depend on improvements in scientific and technical knowledge and in instrumentation quality, as well as on better use of advanced mathematical tools and development of new ones. In this volume, scientists from both the mathematical and the metrological fields exchange their experiences. Industrial sectors, such as instrumentation and software, will benefit from this exchange, since metrology has a high impact on the overall quality of industrial products, and applied mathematics is becoming more and more important in industrial processes.This book is of interest to people

  7. Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach.

    Science.gov (United States)

    Su, Peng; Wang, Yuhao; Burge, James H; Kaznatcheev, Konstantine; Idir, Mourad

    2012-05-21

    In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision and accuracy better than 100 nrad (rms) and ~200 nrad (rms), respectively, with a lateral resolution of few mm or less. We present results of the calibration of the metrology systems, discuss their accuracy and address the precision in measuring a spherical mirror.

  8. Economic benefits of metrology in manufacturing

    DEFF Research Database (Denmark)

    Savio, Enrico; De Chiffre, Leonardo; Carmignato, S.

    2016-01-01

    In streamlined manufacturing systems, the added value of inspection activities is often questioned, and metrology in particular is sometimes considered only as an avoidable expense. Documented quantification of economic benefits of metrology is generally not available. This work presents concrete...... examples from industrial production, in which the added value of metrology in manufacturing is discussed and quantified. Case studies include: general manufacturing, forging, machining, and related metrology. The focus of the paper is on the improved effectiveness of metrology when used at product...... and process design stages, as well as on the improved accuracy and efficiency of manufacturing through better measuring equipment and process chains with integrated metrology for process control....

  9. Metrological multispherical freeform artifact

    Science.gov (United States)

    Blobel, Gernot; Wiegmann, Axel; Siepmann, Jens; Schulz, Michael

    2016-07-01

    Precisely known artifacts are required to characterize the accuracy of asphere and freeform measuring instruments. To this end the best knowledge of the surface characteristics in conjunction with a low measurement uncertainty are necessary. Because this is a challenging task for typical freeform surfaces used in optical systems, the concept of "metrological" artifacts is introduced. We have developed a multispherical freeform artifact for performance tests of tactile touch probe and contact-free optical measuring systems. The measurement accuracy of the complete form and the deviation from calibrated spherical sections can thus be determined. The radius calibration of multiple spherical sections is performed with an extended radius measuring procedure by interferometry. Evaluated surface forms of different measuring methods and the radii determined can be compared to each other. In this study, a multispherical freeform specimen made of copper, with two differing radii, has been measured by two optical measuring methods, a full field measuring tilted-wave interferometer and a high accuracy cylinder coordinate measuring machine with an optical probe. The surface form measurements are evaluated and compared, and the radii determined are compared to the results of a radius measurement bench.

  10. Frequency Standards and Metrology

    Science.gov (United States)

    Maleki, Lute

    2009-04-01

    Preface / Lute Maleki -- Symposium history / Jacques Vanier -- Symposium photos -- pt. I. Fundamental physics. Variation of fundamental constants from the big bang to atomic clocks: theory and observations (Invited) / V. V. Flambaum and J. C. Berengut. Alpha-dot or not: comparison of two single atom optical clocks (Invited) / T. Rosenband ... [et al.]. Variation of the fine-structure constant and laser cooling of atomic dysprosium (Invited) / N. A. Leefer ... [et al.]. Measurement of short range forces using cold atoms (Invited) / F. Pereira Dos Santos ... [et al.]. Atom interferometry experiments in fundamental physics (Invited) / S. W. Chiow ... [et al.]. Space science applications of frequency standards and metrology (Invited) / M. Tinto -- pt. II. Frequency & metrology. Quantum metrology with lattice-confined ultracold Sr atoms (Invited) / A. D. Ludlow ... [et al.]. LNE-SYRTE clock ensemble: new [symbol]Rb hyperfine frequency measurement - spectroscopy of [symbol]Hg optical clock transition (Invited) / M. Petersen ... [et al.]. Precise measurements of S-wave scattering phase shifts with a juggling atomic clock (Invited) / S. Gensemer ... [et al.]. Absolute frequency measurement of the [symbol] clock transition (Invited) / M. Chwalla ... [et al.]. The semiclassical stochastic-field/atom interaction problem (Invited) / J. Camparo. Phase and frequency noise metrology (Invited) / E. Rubiola ... [et al.]. Optical spectroscopy of atomic hydrogen for an improved determination of the Rydberg constant / J. L. Flowers ... [et al.] -- pt. III. Clock applications in space. Recent progress on the ACES mission (Invited) / L. Cacciapuoti and C. Salomon. The SAGAS mission (Invited) / P. Wolf. Small mercury microwave ion clock for navigation and radioScience (Invited) / J. D. Prestage ... [et al.]. Astro-comb: revolutionizing precision spectroscopy in astrophysics (Invited) / C. E. Kramer ... [et al.]. High frequency very long baseline interferometry: frequency standards and

  11. Dimensional micro and nano metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; da Costa Carneiro, Kim; Haitjema, Han

    2006-01-01

    The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer these chal......The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer...... these challenges. The developments have to include new measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration. The current paper describes issues and challenges in dimensional micro and nano metrology by reviewing typical measurement tasks and available...

  12. Metrology - Beyond the Calibration Lab

    Science.gov (United States)

    Mimbs, Scott M.

    2008-01-01

    We rely on data from measurements every day; a gas-pump, a speedometer, and a supermarket weight scale are just three examples of measurements we use to make decisions. We generally accept the data from these measurements as "valid." One reason we can accept the data is the "legal metrology" requirements established and regulated by the government in matters of commerce. The measurement data used by NASA, other government agencies, and industry can be critical to decisions which affect everything from economic viability, to mission success, to the security of the nation. Measurement data can even affect life and death decisions. Metrology requirements must adequately provide for risks associated with these decisions. To do this, metrology must be integrated into all aspects of an industry including research, design, testing, and product acceptance. Metrology, the science of measurement, has traditionally focused on the calibration of instruments, and although instrument calibration is vital, it is only a part of the process that assures quality in measurement data. For example, measurements made in research can influence the fundamental premises that establish the design parameters, which then flow down to the manufacturing processes, and eventually impact the final product. Because a breakdown can occur anywhere within this cycle, measurement quality assurance has to be integrated into every part of the life-cycle process starting with the basic research and ending with the final product inspection process. The purpose of this paper is to discuss the role of metrology in the various phases of a product's life-cycle. For simplicity, the cycle will be divided in four broad phases, with discussions centering on metrology within NASA. .

  13. Metrological Reliability of Medical Devices

    Science.gov (United States)

    Costa Monteiro, E.; Leon, L. F.

    2015-02-01

    The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

  14. Celtiberian metrology and its romanization

    Directory of Open Access Journals (Sweden)

    Leonard A. CURCHIN

    2013-05-01

    Full Text Available Celtiberian metrology has scarcely been investigated until now, with the exception of coin weights. On the basis of measurements of pre-Roman mud bricks, a Celtiberian foot of 24 cm is proposed. With regard to weights, we can accept a module of 9 g for silver jewelry and some bronze coins; however, loom weights do not conform to any metrological system. Over time, Roman measures of length (as indicated by the dimensions of bricks, tiles and architectural monuments and weight were adopted.

  15. The Limits of CD Metrology

    Science.gov (United States)

    Rice, Bryan J.; Cao, Heidi; Grumski, Michael; Roberts, Jeanette

    2005-09-01

    One of the many technology decisions facing the semiconductor industry for the 32 nm node (and beyond) is the selection of the best critical dimension (CD) metrology equipment to meet the needs of process equipment suppliers and semiconductor manufacturers. Over the past three years Intel ® has fabricated a variety of test structures and performed a number of technology evaluations aimed at determining the limits of today's CD metrology. In this paper we discuss the capability of those technologies to measure structures having dimensions representative of the 45 nm, 32 nm, and 22 nm nodes.

  16. Quantum Computing, Metrology, and Imaging

    CERN Document Server

    Lee, H; Dowling, J P; Lee, Hwang; Lougovski, Pavel; Dowling, Jonathan P.

    2005-01-01

    Information science is entering into a new era in which certain subtleties of quantum mechanics enables large enhancements in computational efficiency and communication security. Naturally, precise control of quantum systems required for the implementation of quantum information processing protocols implies potential breakthoughs in other sciences and technologies. We discuss recent developments in quantum control in optical systems and their applications in metrology and imaging.

  17. Dimensional Metrology for Microtechnology

    DEFF Research Database (Denmark)

    Bariani, Paolo

    2005-01-01

    of the (large) CMM positioning errors. A geometrical (three dimensional) model, for the Large range AFM was produced and calibration issues discussed following the three dimensional approach. Furthermore, a novel measuring procedure, based on two images, for eliminating the effects of vertical drift...... of one percent, with this instrument. Uncertainty is dominated by residual non linearity after off line correction. SEM based stereo-photogrammetry was also studied. A commercially available software package was purchased. The working hypothesis for the package in use was eucentric tilting. This is only...

  18. A new approach to stitching optical metrology data

    Science.gov (United States)

    King, Christopher W.

    The next generation of optical instruments, including telescopes and imaging apparatus, will generate an increased requirement for larger and more complex optical forms. A major limiting factor for the production of such optical components is the metrology: how do we measure such parts and with respect to what reference datum This metrology can be thought of as part of a complete cycle in the production of optical components and it is currently the most challenging aspect of production. This thesis investigates a new and complete approach to stitching optical metrology data to extend the effective aperture or, in future, the dynamic range of optical metrology instruments. A practical approach is used to build up a complete process for stitching on piano and spherical parts. The work forms a basis upon which a stitching system for aspheres might be developed in the future, which is inherently more complicated. Beginning with a historical perspective and a review of optical polishing and metrology, the work presented relates the commercially available metrology instruments to the stitching process developed. The stitching is then performed by a numerical optimization routine that seeks to join together overlapping sub-aperture measurements by consideration of the aberrations introduced by the measurement scenario, and by the overlap areas between measurements. The stitching is part of a larger project, the PPARC Optical Manipulation and Metrology project, and was to benefit from new wavefront sensing technology developed by a project partner, and to be used for the sub-aperture measurement. Difficult mathematical problems meant that such a wavefront sensor was not avail able for this work and a work-around was therefore developed using commercial instruments. The techniques developed can be adapted to work on commercial ma chine platforms, and in partuicular, the OMAM NPL/UCL swing-arm profilometer described in chapter 5, or the computer controlled polishing machines

  19. Quantum resistance metrology using graphene.

    Science.gov (United States)

    Janssen, T J B M; Tzalenchuk, A; Lara-Avila, S; Kubatkin, S; Fal'ko, V I

    2013-10-01

    In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

  20. Precision Metrology Using Weak Measurements

    Science.gov (United States)

    Zhang, Lijian; Datta, Animesh; Walmsley, Ian A.

    2015-05-01

    Weak values and measurements have been proposed as a means to achieve dramatic enhancements in metrology based on the greatly increased range of possible measurement outcomes. Unfortunately, the very large values of measurement outcomes occur with highly suppressed probabilities. This raises three vital questions in weak-measurement-based metrology. Namely, (Q1) Does postselection enhance the measurement precision? (Q2) Does weak measurement offer better precision than strong measurement? (Q3) Is it possible to beat the standard quantum limit or to achieve the Heisenberg limit with weak measurement using only classical resources? We analyze these questions for two prototypical, and generic, measurement protocols and show that while the answers to the first two questions are negative for both protocols, the answer to the last is affirmative for measurements with phase-space interactions, and negative for configuration space interactions. Our results, particularly the ability of weak measurements to perform at par with strong measurements in some cases, are instructive for the design of weak-measurement-based protocols for quantum metrology.

  1. Metrology at Philip Morris Europe

    Directory of Open Access Journals (Sweden)

    Gualandris R

    2014-12-01

    Full Text Available The importance of the metrology function at Philip Morris Europe (PME, a multinational organisation producing at over 40 sites in the European, Middle Eastern and African Regions is presented. Standardisation of test methods and equipment as well as the traceability of calibration gauges to the same reference gauge are essential in order to obtain comparable results among the various production centers. The metrology function as well as the qualification of instruments and the drafting of test and calibration operating procedures for this region are conducted or co-ordinated by the Research and Development Department in Neuchatel, Switzerland. In this paper the metrology function within PME is presented based on the measurement of the resistance to draw for which the PME R&D laboratory is accredited (ISO/CEI 17025, as both a calibration and a testing laboratory. The following topics are addressed in this paper: traceability of calibration standards to national standards; comparison of results among manufacturing centres; the choice, the budget as well as the computation of uncertainties. Furthermore, some practical aspects related to the calibration and use of the glass multicapillary gauges are discussed.

  2. Flexible resources for quantum metrology

    Science.gov (United States)

    Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

    2017-06-01

    Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

  3. Precision metrology using weak measurements.

    Science.gov (United States)

    Zhang, Lijian; Datta, Animesh; Walmsley, Ian A

    2015-05-29

    Weak values and measurements have been proposed as a means to achieve dramatic enhancements in metrology based on the greatly increased range of possible measurement outcomes. Unfortunately, the very large values of measurement outcomes occur with highly suppressed probabilities. This raises three vital questions in weak-measurement-based metrology. Namely, (Q1) Does postselection enhance the measurement precision? (Q2) Does weak measurement offer better precision than strong measurement? (Q3) Is it possible to beat the standard quantum limit or to achieve the Heisenberg limit with weak measurement using only classical resources? We analyze these questions for two prototypical, and generic, measurement protocols and show that while the answers to the first two questions are negative for both protocols, the answer to the last is affirmative for measurements with phase-space interactions, and negative for configuration space interactions. Our results, particularly the ability of weak measurements to perform at par with strong measurements in some cases, are instructive for the design of weak-measurement-based protocols for quantum metrology.

  4. Nonlinear metrology with a quantum interface

    OpenAIRE

    Napolitano, M.; Mitchell, M. W.

    2009-01-01

    We describe nonlinear quantum atom-light interfaces and nonlinear quantum metrology in the collective continuous variable formalism. We develop a nonlinear effective Hamiltonian in terms of spin and polarization collective variables and show that model Hamiltonians of interest for nonlinear quantum metrology can be produced in $^{87}$Rb ensembles. With these Hamiltonians, metrologically relevant atomic properties, e.g. the collective spin, can be measured better than the "Heisenberg limit" $\\...

  5. TNO TPD contributions to high precision optical metrology, a Darwin metrology breadboard for ESA

    NARCIS (Netherlands)

    Verlaan, A.L.; Dool, T.C. van den; Braam, B.C.; Calvel, B.; Sesselman, R.; Pöschel, W.; Dontsov, D.; Vega, I.C.; Manske, E.; Schuldt, T.; Sodnik, Z.

    2004-01-01

    A Darwin precursor breadboard, comprising both fine lateral and longitudinal metrology sensors was designed, built and partially tested. The lateral metrology sensor was designed and built by TNO TPD and more than meets the imposed requirements. The longitudinal metrology sensor consists of a dual

  6. TNO TPD contributions to high precision optical metrology, a Darwin metrology breadboard for ESA

    NARCIS (Netherlands)

    Verlaan, A.L.; Dool, T.C. van den; Braam, B.C.; Calvel, B.; Sesselman, R.; Pöschel, W.; Dontsov, D.; Vega, I.C.; Manske, E.; Schuldt, T.; Sodnik, Z.

    2004-01-01

    A Darwin precursor breadboard, comprising both fine lateral and longitudinal metrology sensors was designed, built and partially tested. The lateral metrology sensor was designed and built by TNO TPD and more than meets the imposed requirements. The longitudinal metrology sensor consists of a dual w

  7. Heisenberg limit superradiant superresolving metrology.

    Science.gov (United States)

    Wang, Da-Wei; Scully, Marlan O

    2014-08-22

    We propose a superradiant metrology technique to achieve the Heisenberg limit superresolving displacement measurement by encoding multiple light momenta into a three-level atomic ensemble. We use 2N coherent pulses to prepare a single excitation superradiant state in a superposition of two timed Dicke states that are 4N light momenta apart in momentum space. The phase difference between these two states induced by a uniform displacement of the atomic ensemble has 1/4N sensitivity. Experiments are proposed in crystals and in ultracold atoms.

  8. Loschmidt echo for quantum metrology

    Science.gov (United States)

    Macrı, Tommaso; Smerzi, Augusto; Pezzè, Luca

    2016-07-01

    We propose a versatile Loschmidt echo protocol to detect and quantify multiparticle entanglement. It allows us to extract the quantum Fisher information for arbitrary pure states, and finds direct application in quantum metrology. In particular, the protocol applies to states that are generally difficult to characterize, as non-Gaussian states, and states that are not symmetric under particle exchange. We focus on atomic systems, including trapped ions, polar molecules, and Rydberg atoms, where entanglement is generated dynamically via long-range interaction, and show that the protocol is stable against experimental detection errors.

  9. Pico meter metrology for the GAIA mission

    NARCIS (Netherlands)

    Meijer, E.A.; Nijenhuis, J.N.; Vink, R.J.P.; Kamphues, F.G.; Gielesen, W.L.M.; Coatantiec, C.

    2009-01-01

    To measure the relative motions of GAIA's telescopes, the angle between the telescopes is monitored by an all Silicon Carbide Basic Angle Monitoring subsystem (BAM OMA). TNO is developing this metrology system. The stability requirements for this metrology system go into the pico meter and pico radi

  10. Metrology Careers: Jobs for Good Measure

    Science.gov (United States)

    Liming, Drew

    2009-01-01

    What kind of career rewards precision and accuracy? One in metrology--the science of measurement. By evaluating and calibrating the technology in people's everyday lives, metrologists keep their world running smoothly. Metrology is used in the design and production of almost everything people encounter daily, from the cell phones in their pockets…

  11. Fractal Metrology for biogeosystems analysis

    Directory of Open Access Journals (Sweden)

    V. Torres-Argüelles

    2010-11-01

    Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  12. Fractal Metrology for biogeosystems analysis

    Science.gov (United States)

    Torres-Argüelles, V.; Oleschko, K.; Tarquis, A. M.; Korvin, G.; Gaona, C.; Parrot, J.-F.; Ventura-Ramos, E.

    2010-11-01

    The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay) and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc.) while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM). We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  13. Fractal metrology for biogeosystems analysis

    Directory of Open Access Journals (Sweden)

    V. Torres-Argüelles

    2010-06-01

    Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes. In the present research, this pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate'' Clay and compared in terms of roughness of the gray-intensity distribution (the measurand quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them and to the measurement function which best fits to the experimental results. Some of the applied techniques are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of all these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM through a case study of soil physical and chemical degradation applying the selected toolbox to describe and compare the main structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

  14. Metrology in Pharmaceutical Industry - A Case Study

    Science.gov (United States)

    Yuvamoto, Priscila D.; Fermam, Ricardo K. S.; Nascimento, Elizabeth S.

    2016-07-01

    Metrology is recognized by improving production process, increasing the productivity, giving more reliability to the measurements and consequently, it impacts in the economy of a country. Pharmaceutical area developed GMP (Good Manufacture Practice) requeriments, with no introduction of metrological concepts. However, due to Nanomedicines, it is expected this approach and the consequent positive results. The aim of this work is to verify the level of metrology implementation in a Brazilian pharmaceutical industry, using a case study. The purpose is a better mutual comprehension by both areas, acting together and governmental support to robustness of Brazilian pharmaceutical area.

  15. 100 years of radionuclide metrology.

    Science.gov (United States)

    Judge, S M; Arnold, D; Chauvenet, B; Collé, R; De Felice, P; García-Toraño, E; Wätjen, U

    2014-05-01

    The discipline of radionuclide metrology at national standards institutes started in 1913 with the certification by Curie, Rutherford and Meyer of the first primary standards of radium. In early years, radium was a valuable commodity and the aim of the standards was largely to facilitate trade. The focus later changed to providing standards for the new wide range of radionuclides, so that radioactivity could be used for healthcare and industrial applications while minimising the risk to patients, workers and the environment. National measurement institutes responded to the changing demands by developing new techniques for realising primary standards of radioactivity. Looking ahead, there are likely to be demands for standards for new radionuclides used in nuclear medicine, an expansion of the scope of the field into quantitative imaging to facilitate accurate patient dosimetry for nuclear medicine, and an increasing need for accurate standards for radioactive waste management and nuclear forensics.

  16. Swept Frequency Laser Metrology System

    Science.gov (United States)

    Zhao, Feng (Inventor)

    2010-01-01

    A swept frequency laser ranging system having sub-micron accuracy that employs multiple common-path heterodyne interferometers, one coupled to a calibrated delay-line for use as an absolute reference for the ranging system. An exemplary embodiment uses two laser heterodyne interferometers to create two laser beams at two different frequencies to measure distance and motions of target(s). Heterodyne fringes generated from reflections off a reference fiducial X(sub R) and measurement (or target) fiducial X(sub M) are reflected back and are then detected by photodiodes. The measured phase changes Delta phi(sub R) and Delta phi (sub m) resulting from the laser frequency swept gives target position. The reference delay-line is the only absolute reference needed in the metrology system and this provides an ultra-stable reference and simple/economical system.

  17. Metrology for Fuel Cell Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Stocker, Michael [National Inst. of Standards and Technology, Gaithersburg, MD (United States); Stanfield, Eric [National Inst. of Standards and Technology, Gaithersburg, MD (United States)

    2015-02-04

    The project was divided into three subprojects. The first subproject is Fuel Cell Manufacturing Variability and Its Impact on Performance. The objective was to determine if flow field channel dimensional variability has an impact on fuel cell performance. The second subproject is Non-contact Sensor Evaluation for Bipolar Plate Manufacturing Process Control and Smart Assembly of Fuel Cell Stacks. The objective was to enable cost reduction in the manufacture of fuel cell plates by providing a rapid non-contact measurement system for in-line process control. The third subproject is Optical Scatterfield Metrology for Online Catalyst Coating Inspection of PEM Soft Goods. The objective was to evaluate the suitability of Optical Scatterfield Microscopy as a viable measurement tool for in situ process control of catalyst coatings.

  18. Optical metrology at the Optical Sciences Center: an historical review

    Science.gov (United States)

    Creath, Katherine; Parks, Robert E.

    2014-10-01

    The Optical Sciences Center (OSC) begun as a graduate-level applied optics teaching institution to support the US space effort. The making of optics representative of those used in other space programs was deemed essential. This led to the need for optical metrology: at first Hartmann tests, but almost immediately to interferometric tests using the newly invented HeNe laser. Not only were new types of interferometers needed, but the whole infrastructure that went with testing, fringe location methods, aberration removal software and contour map generation to aid the opticians during polishing needed to be developed. Over the last half century more rapid and precise methods of interferogram data reduction, surface roughness measurement, and methods of instrument calibration to separate errors from those in the optic have been pioneered at OSC. Other areas of research included null lens design and the writing of lens design software that led into the design of computer generated holograms for asphere testing. More recently work has been done on the reduction of speckle noise in interferograms, methods to test large convex aspheres, and a return to slope measuring tests to increase the dynamic range of the types of aspheric surfaces amenable to optical testing including free-form surfaces. This paper documents the history of the development of optical testing projects at OSC and highlights the contributions some of the individuals associated with new methods of testing and the infrastructure needed to support the testing. We conclude with comments about the future trends optical metrology.

  19. National Needs for Appearance Metrology

    Science.gov (United States)

    Nadal, Maria E.

    2003-04-01

    Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

  20. The quality of measurements a metrological reference

    CERN Document Server

    Fridman, A E

    2012-01-01

    This book provides a detailed discussion and commentary on the fundamentals of metrology. The fundamentals of metrology, the principles underlying the design of the SI International System of units, the theory of measurement error, a new methodology for estimation of measurement accuracy based on uncertainty, and methods for reduction of measured results and estimation of measurement uncertainty are all discussed from a modern point of view. The concept of uncertainty is shown to be consistent with the classical theory of accuracy. The theory of random measurement errors is supplemented by a very general description based on the generalized normal distribution; systematic instrumental error is described in terms of a methodology for normalizing the metrological characteristics of measuring instruments. A new international system for assuring uniformity of measurements based on agreements between national metrological institutes is discussed, in addition to the role and procedure for performance of key compari...

  1. Optical metrology techniques for dimensional stability measurements

    NARCIS (Netherlands)

    Ellis, Jonathan David

    2010-01-01

    This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

  2. Optical metrology techniques for dimensional stability measurements

    NARCIS (Netherlands)

    Ellis, Jonathan David

    2010-01-01

    This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

  3. Improving metrology for micro-optics manufacturing

    Science.gov (United States)

    Davies, Angela D.; Bergner, Brent C.; Gardner, Neil W.

    2003-11-01

    Metrology is one of the critical enabling technologies for realizing the full market potential for micro-optical systems. Measurement capabilities are currently far behind present and future needs. Much of today"s test equipment was developed for the micro-electronics industry and is not optimized for micro-optic materials and geometries. Metrology capabilities currently limit the components that can be realized, in many cases. Improved testing will be come increasingly important as the technology moves to integration where it will become important to "test early and test often" to achieve high yields. In this paper, we focus on micro-refractive components in particular, and describe measurement challenges for this class of components and current and future needs. We also describe a new micro-optics metrology research program at UNC Charlotte under the Center for Precision Metrology and the new Center for Optoelectronics and Optical Communications to address these needs.

  4. New approaches in diffraction based optical metrology

    Science.gov (United States)

    Ebert, M.; Vanoppen, P.; Jak, M.; v. d. Zouw, G.; Cramer, H.; Nooitgedagt, T.; v. d. Laan, H.

    2016-03-01

    Requirements for on-product overlay, focus and CD uniformity continue to tighten in order to support the demands of 10nm and 7nm nodes. This results in the need for simultaneously accurate, robust and dense metrology data as input for closed-loop control solutions thereby enabling wafer-level control and high order corrections. In addition the use of opaque materials and stringent design rules drive the need for expansion of the available measurement wavelengths and metrology target design space. Diffraction based optical metrology has been established as the leading methodology for integrated as well as standalone optical metrology for overlay, focus and CD monitoring and control in state of the art chip manufacturing. We are presenting the new approaches to diffraction based optical metrology designed to meet the processing diffraction based metrology signals. In this paper we will present the new detection principle and its impact on key performance characteristics of overlay and focus measurements. We will also describe the wide range of applications of a newly introduced increased measurement spot size, enabling significant improvements to accuracy and process robustness of overlay and focus measurements. With the YS350E the optical CD measurement capability is also extended, to 10x10μm2 targets. We will discuss the performance and value of small targets in after-develop and after-etch applications.

  5. NIF Target Assembly Metrology Methodology and Results

    Energy Technology Data Exchange (ETDEWEB)

    Alger, E. T. [General Atomics, San Diego, CA (United States); Kroll, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Dzenitis, E. G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Montesanti, R. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Hughes, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Swisher, M. [IAP, Livermore, CA (United States); Taylor, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Segraves, K. [IAP, Livermore, CA (United States); Lord, D. M. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Reynolds, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Castro, C. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Edwards, G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

    2011-01-01

    During our inertial confinement fusion (ICF) experiments at the National Ignition Facility (NIF) we require cryogenic targets at the 1-cm scale to be fabricated, assembled, and metrologized to micron-level tolerances. During assembly of these ICF targets, there are physical dimensmetrology is completed using optical coordinate measurement machines that provide repeatable measurements with micron precision, while also allowing in-process data collection for absolute accuracy in assembly. To date, 51 targets have been assembled and metrologized, and 34 targets have been successfully fielded on NIF relying on these metrology data. In the near future, ignition experiments on NIF will require tighter tolerances and more demanding target assembly and metrology capability. Metrology methods, calculations, and uncertainty estimates will be discussed. Target diagnostic port alignment, target position, and capsule location results will be reviewed for the 2009 Energetics Campaign. The information is presented via control charts showing the effect of process improvements that were made during target production. Certain parameters, including capsule position, met the 2009 campaign specifications but will have much tighter requirements in the future. Finally, in order to meet these new requirements assembly process changes and metrology capability upgrades will be necessary.

  6. Optical vortex metrology: Are phase singularities foes or friends in optical metrology?

    DEFF Research Database (Denmark)

    Takeda, M.; Wang, W.; Hanson, Steen Grüner;

    2008-01-01

    We raise an issue whether phase singularities are foes or friends in optical metrology, and give an answer by introducing the principle and applications of a new technique which we recently proposed for displacement and flow measurements. The technique is called optical vortex metrology because...

  7. Nuclear Technology. Course 26: Metrology. Module 27-7, Statistical Techniques in Metrology.

    Science.gov (United States)

    Espy, John; Selleck, Ben

    This seventh in a series of eight modules for a course titled Metrology focuses on descriptive and inferential statistical techniques in metrology. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6) materials…

  8. Nuclear Technology. Course 27: Metrology. Module 27-1, Fundamentals of Metrology.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This first in a series of eight modules for a course titled Metrology describes the fundamentals of metrology as they pertain to dimensional inspection. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6)…

  9. Spacetime Metrology with LISA Pathfinder

    CERN Document Server

    Congedo, Giuseppe

    2012-01-01

    LISA is the proposed ESA-NASA gravitational wave detector in the 0.1 mHz - 0.1 Hz band. LISA Pathfinder is the down-scaled version of a single LISA arm. The arm -- named Doppler link -- can be treated as a differential accelerometer, measuring the relative acceleration between test masses. LISA Pathfinder -- the in-flight test of the LISA instrumentation -- is currently in the final implementation and planned to be launched in 2014. It will set stringent constraints on the ability to put test masses in geodesic motion to within the required differential acceleration of 3\\times10^{-14} m s^{-2} Hz^{-1/2} and track their relative motion to within the required differential displacement measurement noise of 9\\times10^{-12} m Hz^{-1/2}, around 1 mHz. Given the scientific objectives, it will carry out -- for the first time with such high accuracy required for gravitational wave detection -- the science of spacetime metrology, in which the Doppler link between two free-falling test masses measures the curvature. Thi...

  10. Ocular microtremor laser speckle metrology

    Science.gov (United States)

    Al-Kalbani, M.; Mihaylova, E.; Collins, N.; Toal, V.; Coakley, D.; Boyle, G.

    2009-02-01

    Ocular Microtremor (OMT) is a continual, high frequency physiological tremor of the eye present in all subjects even when the eye is apparently at rest. OMT causes a peak to peak displacement of around 150nm-2500nm with a broadband frequency spectrum between 30Hz to 120Hz; with a peak at about 83Hz. OMT carries useful clinical information on depth of consciousness and on some neurological disorders. Nearly all quantitative clinical investigations have been based on OMT measurements using an eye contacting piezoelectric probe which has low clinical acceptability. Laser speckle metrology is a candidate for a high resolution, non-contacting, compact, portable OMT measurement technique. However, tear flow and biospeckle might be expected to interfere with the displacement information carried by the speckle. The paper investigates the properties of the scattered speckle of laser light (λ = 632.8nm) from the eye sclera to assess the feasibility of using speckle techniques to measure OMT such as the speckle correlation. The investigation is carried using a high speed CMOS video camera adequate to capture the high frequency of the tremor. The investigation is supported by studies using an eye movement simulator (a bovine sclera driven by piezoelectric bimorphs). The speckle contrast and the frame to frame spatiotemporal variations are analyzed to determine if the OMT characteristics are detectable within speckle changes induced by the biospeckle or other movements.

  11. Coherent double-color interference microscope for traceable optical surface metrology

    Science.gov (United States)

    Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

    2016-06-01

    Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

  12. Final-part metrology for LIGA springs, Build Group 1.

    Energy Technology Data Exchange (ETDEWEB)

    Aigeldinger, Georg; Skala, Dawn M.; Ceremuga, Joseph T.; Mills, Bernice E.

    2004-03-01

    The LIGA spring is a recently designed part for defense program applications. The Sandia California LIGA team has produced an initial group build of these nickel alloy parts. These are distinctive in having a macroscopic lateral size of about 1 cm, while requiring microscopic dimensional precision on the order of a few micrometers. LIGA technology capabilities at Sandia are able to manufacture such precise structures. While certain aspects of the LIGA process and its production capabilities have been dimensionally characterized in the past, [1-6] the present work is exclusive in defining a set of methods and techniques to inspect and measure final LIGA nickel alloy parts in large prototype quantities. One hundred percent inspection, meaning that every single LIGA part produced needs to be measured, ensures quality control and customer satisfaction in this prototype production run. After a general visual inspection of the parts and an x-ray check for voids, high precision dimensional metrology tools are employed. The acquired data is analyzed using both in house and commercially available software. Examples of measurements illustrating these new metrology capabilities are presented throughout the report. These examples furthermore emphasize that thorough inspection of every final part is not only essential to characterize but also improve the LIGA manufacturing process.

  13. Hybrid photonic chip interferometer for embedded metrology

    Science.gov (United States)

    Kumar, P.; Martin, H.; Maxwell, G.; Jiang, X.

    2014-03-01

    Embedded metrology is the provision of metrology on the manufacturing platform, enabling measurement without the removal of the work piece. Providing closer integration of metrology upon the manufacturing platform can lead to the better control and increased throughput. In this work we present the development of a high precision hybrid optical chip interferometer metrology device. The complete metrology sensor system is structured into two parts; optical chip and optical probe. The hybrid optical chip interferometer is based on a silica-on-silicon etched integrated-optic motherboard containing waveguide structures and evanescent couplers. Upon the motherboard, electro-optic components such as photodiodes and a semiconductor gain block are mounted and bonded to provide the required functionality. The key structure in the device is a tunable laser module based upon an external-cavity diode laser (ECDL). Within the cavity is a multi-layer thin film filter which is rotated to select the longitudinal mode at which the laser operates. An optical probe, which uses a blazed diffracting grating and collimating objective lens, focuses light of different wavelengths laterally over the measurand. Incident laser light is then tuned in wavelength time to effectively sweep an `optical stylus' over the surface. Wavelength scanning and rapid phase shifting can then retrieve the path length change and thus the surface height. We give an overview of the overall design of the final hybrid photonic chip interferometer, constituent components, device integration and packaging as well as experimental test results from the current version now under evaluation.

  14. Metrology For Emerging Research Materials And Devices

    Science.gov (United States)

    Garner, C. Michael; Herr, Dan

    2007-09-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] identifies a number of potentially enabling device and materials technologies to extend and compliment CMOS. These emerging memory and logic devices employ alternate "states" including 1D charge state, molecular state, polarization, material phase, and spin. The improvement of these materials and devices depends on utilizing existing and new metrology methods to characterize their structure, composition and emerging critical properties at the nanometer scale. The metrology required to characterize nanomaterials, interfaces, and device structures will include existing structural metrology, such as TEM, SEM, and others, as well as metrology to characterize new "state" properties of the materials. The characterization of properties and correlations to nanostructure and composition are critical for these new devices and materials. Characterizing the properties of emerging logic technologies will be very difficult, as an applied stimulus is required to probe dynamic state changes. In many cases, it will be important simultaneously to measure the spatial variation of multiple state properties, such as charge and spin, as a function of time at high frequencies to develop an understanding of the interactions occurring in the materials and at interfaces. Furthermore, the challenge of characterizing interface structure/composition and "state" interactions likely will increase with device scaling. New metrology capabilities are needed to study the static and dynamic properties of potential alternate "state" materials and devices at small dimensions.

  15. Multi-petahertz electronic metrology.

    Science.gov (United States)

    Garg, M; Zhan, M; Luu, T T; Lakhotia, H; Klostermann, T; Guggenmos, A; Goulielmakis, E

    2016-10-20

    The frequency of electric currents associated with charge carriers moving in the electronic bands of solids determines the speed limit of electronics and thereby that of information and signal processing. The use of light fields to drive electrons promises access to vastly higher frequencies than conventionally used, as electric currents can be induced and manipulated on timescales faster than that of the quantum dephasing of charge carriers in solids. This forms the basis of terahertz (10(12) hertz) electronics in artificial superlattices, and has enabled light-based switches and sampling of currents extending in frequency up to a few hundred terahertz. Here we demonstrate the extension of electronic metrology to the multi-petahertz (10(15) hertz) frequency range. We use single-cycle intense optical fields (about one volt per ångström) to drive electron motion in the bulk of silicon dioxide, and then probe its dynamics by using attosecond (10(-18) seconds) streaking to map the time structure of emerging isolated attosecond extreme ultraviolet transients and their optical driver. The data establish a firm link between the emission of the extreme ultraviolet radiation and the light-induced intraband, phase-coherent electric currents that extend in frequency up to about eight petahertz, and enable access to the dynamic nonlinear conductivity of silicon dioxide. Direct probing, confinement and control of the waveform of intraband currents inside solids on attosecond timescales establish a method of realizing multi-petahertz coherent electronics. We expect this technique to enable new ways of exploring the interplay between electron dynamics and the structure of condensed matter on the atomic scale.

  16. Distributed large-scale dimensional metrology new insights

    CERN Document Server

    Franceschini, Fiorenzo; Maisano, Domenico

    2011-01-01

    Focuses on the latest insights into and challenges of distributed large scale dimensional metrology Enables practitioners to study distributed large scale dimensional metrology independently Includes specific examples of the development of new system prototypes

  17. Joint Research on Scatterometry and AFM Wafer Metrology

    NARCIS (Netherlands)

    Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.

    2011-01-01

    Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both

  18. Advances in Solar Radiometry and Metrology

    Energy Technology Data Exchange (ETDEWEB)

    Myers, D.; Andreas, A.; Reda, I.; Gotseff, P.; Wilcox, S.; Stoffel, T.; Anderberg, M.

    2005-01-01

    The Solar Radiometry and Metrology task at the National Renewable Energy Laboratory (NREL) provides traceable optical radiometric calibrations and measurements to photovoltaic (PV) researchers and the PV industry. Traceability of NREL solar radiometer calibrations to the World Radiometric Reference (WRR) was accomplished during the NREL Pyrheliometer Comparison in October 2003. The task has calibrated 10 spectral and more than 180 broadband radiometers for solar measurements. Other accomplishments include characterization of pyranometer thermal offset errors with laboratory and spectral modeling tools; developing a simple scheme to correct pyranometer data for known responsivity variations; and measuring detailed spectral distributions of the NREL High Intensity Pulsed Solar Simulator (HIPSS) as a function of lamp voltage and time. The optical metrology functions support the NREL Measurement and Characterization Task effort for ISO 17025 accreditation of NREL Solar Reference Cell Calibrations. Optical metrology functions have been integrated into the NREL quality system and audited for ISO17025 compliance.

  19. Metrology and properties of engineering surfaces

    CERN Document Server

    Greenwood, J; Chetwynd, D

    2001-01-01

    Metrology and Properties of Engineering Surfaces provides in a single volume a comprehensive and authoritative treatment of the crucial topics involved in the metrology and properties of engineering surfaces. The subject matter is a central issue in manufacturing technology, since the quality and reliability of manufactured components depend greatly upon the selection and qualities of the appropriate materials as ascertained through measurement. The book can in broad terms be split into two parts; the first deals with the metrology of engineering surfaces and covers the important issues relating to the measurement and characterization of surfaces in both two and three dimensions. This covers topics such as filtering, power spectral densities, autocorrelation functions and the use of Fractals in topography. A significant proportion is dedicated to the calibration of scanning probe microscopes using the latest techniques. The remainder of the book deals with the properties of engineering surfaces and covers a w...

  20. Mask Design for the Space Interferometry Mission Internal Metrology

    Science.gov (United States)

    Marx, David; Zhao, Feng; Korechoff, Robert

    2005-01-01

    This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

  1. Coordinate Metrology by Traceable Computed Tomography

    DEFF Research Database (Denmark)

    Müller, Pavel

    metrology and coordinate metrology and is currently becoming more and more important measuring technique for dimensional measurements. This is mainly due to the fact that with CT, a complete three-dimensional model of the scanned part is in a relatively short time visualized using a computer...... is an important factor for decision making about manufactured parts. However, due to many influences in CT, estimation of the uncertainty is a challenge, also because standardized procedures and guidelines are not available yet. In this thesis, several methods for uncertainty estimation were applied in connection...

  2. Semiconductor strain metrology principles and applications

    CERN Document Server

    Wong, Terence KS

    2012-01-01

    This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this e-book specifically discusses strain metrol

  3. Vacuum Technology Considerations For Mass Metrology

    Science.gov (United States)

    Abbott, Patrick J.; Jabour, Zeina J.

    2011-01-01

    Vacuum weighing of mass artifacts eliminates the necessity of air buoyancy correction and its contribution to the measurement uncertainty. Vacuum weighing is also an important process in the experiments currently underway for the redefinition of the SI mass unit, the kilogram. Creating the optimum vacuum environment for mass metrology requires careful design and selection of construction materials, plumbing components, pumping, and pressure gauging technologies. We review the vacuum technology1 required for mass metrology and suggest procedures and hardware for successful and reproducible operation. PMID:26989593

  4. Using entanglement against noise in quantum metrology.

    Science.gov (United States)

    Demkowicz-Dobrzański, Rafal; Maccone, Lorenzo

    2014-12-19

    We analyze the role of entanglement among probes and with external ancillas in quantum metrology. In the absence of noise, it is known that unentangled sequential strategies can achieve the same Heisenberg scaling of entangled strategies and that external ancillas are useless. This changes in the presence of noise; here we prove that entangled strategies can have higher precision than unentangled ones and that the addition of passive external ancillas can also increase the precision. We analyze some specific noise models and use the results to conjecture a general hierarchy for quantum metrology strategies in the presence of noise.

  5. Single shot interferogram analysis for optical metrology.

    Science.gov (United States)

    Singh, Mahendra Pratap; Singh, Mandeep; Khare, Kedar

    2014-10-10

    We report a novel constrained optimization method for single shot interferogram analysis. The unknown test wavefront is estimated as a minimum L2-norm squared solution whose phase is constrained to the space spanned by a finite number of Zernike polynomials. Using a single frame from standard phase shifting datasets, we demonstrate that our approach provides a phase map that matches with that generated using phase shifting algorithms to within λ/100  rms error. Our simulations and experimental results suggest the possibility of a simplified low-cost high quality optical metrology system for performing routine metrology tests involving smooth surface profiles.

  6. Advances in speckle metrology and related techniques

    CERN Document Server

    Kaufmann, Guillermo H

    2010-01-01

    Speckle metrology includes various optical techniques that are based on the speckle fields generated by reflection from a rough surface or by transmission through a rough diffuser. These techniques have proven to be very useful in testing different materials in a non-destructive way. They have changed dramatically during the last years due to the development of modern optical components, with faster and more powerful digital computers, and novel data processing approaches. This most up-to-date overview of the topic describes new techniques developed in the field of speckle metrology over the l

  7. Three-dimensional metrology for printed electronics

    Science.gov (United States)

    Bromberg, Vadim; Harding, Kevin

    2017-05-01

    Novel materials and printing technologies can enable rapid and low cost prototyping and manufacturing of electronic devices with increased flexibility and complexity. However, robust and on-demand printing of circuits will require accurate metrology methods that can measure micron level patterns to verify proper production. This paper presents an evaluation of a range of optical gaging tools ranging from confocal to area 3D systems to determine metrological capability for a range of key parameters from trace thickness to solder paste volumes. Finally, this paper will present a select set of optimized measurement tools detailing both capabilities and gaps in the available technologies needed to fully realize the potential of printed electronics.

  8. DABAM: an open-source database of X-ray mirrors metrology

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez del Rio, Manuel, E-mail: srio@esrf.eu [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Bianchi, Davide [AC2T Research GmbH, Viktro-Kaplan-Strasse 2-C, 2700 Wiener Neustadt (Austria); Cocco, Daniele [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025 (United States); Glass, Mark [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Idir, Mourad [NSLS II, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Metz, Jim [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Raimondi, Lorenzo; Rebuffi, Luca [Elettra-Sincrotrone Trieste SCpA, Basovizza (TS) (Italy); Reininger, Ruben; Shi, Xianbo [Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439 (United States); Siewert, Frank [BESSY II, Helmholtz Zentrum Berlin, Institute for Nanometre Optics and Technology, Albert-Einstein-Strasse 15, 12489 Berlin (Germany); Spielmann-Jaeggi, Sibylle [Swiss Light Source at Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland); Takacs, Peter [Instrumentation Division, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Tomasset, Muriel [Synchrotron Soleil (France); Tonnessen, Tom [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Vivo, Amparo [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Yashchuk, Valeriy [Advanced Light Source, Lawrence Berkeley National Laboratory, MS 15-R0317, 1 Cyclotron Road, Berkeley, CA 94720-8199 (United States)

    2016-04-20

    DABAM, an open-source database of X-ray mirrors metrology to be used with ray-tracing and wave-propagation codes for simulating the effect of the surface errors on the performance of a synchrotron radiation beamline. An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.

  9. FOREWORD: Special issue on Statistical and Probabilistic Methods for Metrology

    Science.gov (United States)

    Bich, Walter; Cox, Maurice G.

    2006-08-01

    This special issue of Metrologia is the first that is not devoted to units, or constants, or measurement techniques in some specific field of metrology, but to the generic topic of statistical and probabilistic methods for metrology. The number of papers on this subject in measurement journals, and in Metrologia in particular, has continued to increase over the years, driven by the publication of the Guide to the Expression of Uncertainty in Measurement (GUM) [1] and the Mutual Recognition Arrangement (MRA) of the CIPM [2]. The former stimulated metrologists to think in greater depth about the appropriate modelling of their measurements, in order to provide uncertainty evaluations associated with measurement results. The latter obliged the metrological community to investigate reliable measures for assessing the calibration and measurement capabilities declared by the national metrology institutes (NMIs). Furthermore, statistical analysis of measurement data became even more important than hitherto, with the need, on the one hand, to treat the greater quantities of data provided by sophisticated measurement systems, and, on the other, to deal appropriately with relatively small sets of data that are difficult or expensive to obtain. The importance of supporting the GUM and extending its provisions was recognized by the formation in the year 2000 of Working Group 1, Measurement uncertainty, of the Joint Committee for Guides in Metrology. The need to provide guidance on key comparison data evaluation was recognized by the formation in the year 2001 of the BIPM Director's Advisory Group on Uncertainty. A further international initiative was the revision, in the year 2004, of the remit and title of a working group of ISO/TC 69, Application of Statistical Methods, to reflect the need to concentrate more on statistical methods to support measurement uncertainty evaluation. These international activities are supplemented by national programmes such as the Software Support

  10. Absolute distance metrology for space interferometers

    NARCIS (Netherlands)

    Swinkels, B.L.; Latoui, A.; Bhattacharya, N.; Wielders, A.A.; Braat, J.J.M.

    2005-01-01

    Future space missions, among which the Darwin Space Interferometer, will consist of several free flying satellites. A complex metrology system is required to have all the components fly accurately in formation and have it operate as a single instrument. Our work focuses on a possible implementation

  11. Traceability and uncertainty estimation in coordinate metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

    2001-01-01

    are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

  12. Status of the Metrology Light Source

    Science.gov (United States)

    Klein, R.; Ulm, G.; Feikes, J.; Hartrott, M. v.; Wüstefeld, G.

    2010-06-01

    The Physikalisch-Technische Bundesanstalt (PTB), the German national metrology institute, has set up the low-energy electron storage ring Metrology Light Source (MLS) in close cooperation with the Helmholtz-Zentrum Berlin (HZB, formerly BESSY). This new storage ring has been in regular user operation since April 2008 and is dedicated to synchrotron-radiation-based metrology and technological developments in the far-IR/THz, IR, UV, VUV and EUV spectral range. The MLS has a double-bend-achromate lattice structure, injection is from a 105 MeV racetrack microtron. The electron energy can be ramped to any value from 105 MeV up to 630 MeV and the electron beam current covers the range from one stored electron (1 pA) up to 200 mA. The MLS is the first electron storage ring optimized for the generation of coherent synchrotron radiation, based on an electron bunch shortening mode. In this mode, MLS delivers coherent radiation in the far-IR/THz spectral range with enhanced intensity as compared to the normal mode of operation. Several beamlines are in operation or in construction, including one undulator beamline, bending magnet beamlines for the calibration of radiation sources and detectors and for reflectometry, an EUV metrology beamline and three IR/THz beamlines.

  13. Note: Near infrared interferometric silicon wafer metrology.

    Science.gov (United States)

    Choi, M S; Park, H M; Joo, K N

    2016-04-01

    In this investigation, two near infrared (NIR) interferometric techniques for silicon wafer metrology are described and verified with experimental results. Based on the transparent characteristic of NIR light to a silicon wafer, the fiber based spectrally resolved interferometry can measure the optical thickness of the wafer and stitching low coherence scanning interferometry can reconstruct entire surfaces of the wafer.

  14. Quantum metrology with cold atomic ensembles

    Directory of Open Access Journals (Sweden)

    Mitchell Morgan W.

    2013-08-01

    Full Text Available Quantum metrology uses quantum features such as entanglement and squeezing to improve the sensitivity of quantum-limited measurements. Long established as a valuable technique in optical measurements such as gravitational-wave detection, quantum metrology is increasingly being applied to atomic instruments such as matter-wave interferometers, atomic clocks, and atomic magnetometers. Several of these new applications involve dual optical/atomic quantum systems, presenting both new challenges and new opportunities. Here we describe an optical magnetometry system that achieves both shot-noise-limited and projection-noise-limited performance, allowing study of optical magnetometry in a fully-quantum regime [1]. By near-resonant Faraday rotation probing, we demonstrate measurement-based spin squeezing in a magnetically-sensitive atomic ensemble [2-4]. The versatility of this system allows us also to design metrologically-relevant optical nonlinearities, and to perform quantum-noise-limited measurements with interacting photons. As a first interaction-based measurement [5], we implement a non-linear metrology scheme proposed by Boixo et al. with the surprising feature of precision scaling better than the 1/N “Heisenberg limit” [6].

  15. Requirements of weighing in legal metrology

    Science.gov (United States)

    Källgren, Håkan; Pendrill, Leslie

    2003-12-01

    A review is given of recent developments in the formulation of requirements of weighing where such measurements are performed in society and industry with legal implications such as safety, fair trade and environmental considerations. Traditional legal metrology in the area of weights and measures has been developed and given an expanded scope in recent years. This reflects, on the one hand, technical and scientific development (computerization of weighing devices, improved weight manufacturing and new methods of magnetism determination, for example), and on the other hand, administrative evolution (global requirements of the market and the Measurement Instrument Directive). Particularly fruitful has been the joint effort by the scientific mass metrology and legal metrology communities in the development in the last decade of international recommendations—especially OIML R111—on weighing. Consensus has been reached in the international weighing forum concerning important areas such as maximum permissible errors for weights, how to calculate measurement uncertainty and how measurement uncertainty should be accounted for in relation to conformity assessment. These international recommendations for weights as mass standards include both tolerances and extensive instructions about various influence quantities that affect the weight result, such as magnetization, surface roughness and volume of weights. Much remains to be done, however: corresponding requirements of weighing devices in particular need to meet the challenges of a rapidly changing technology. The promising collaboration between scientific and legal metrology initiated in the area of weights may act as a model and stimulate similar developments in other areas of metrology, particularly where requirements are generic (for instance uncertainty and conformity) or analogous.

  16. Overlay metrology for double patterning processes

    Science.gov (United States)

    Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

    2009-03-01

    The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double

  17. CONFERENCE NOTE: International Workshop on Advanced Mathematical Tools in Metrology, Villa Gualino, Torino, Italy, 20 22 October 1993

    Science.gov (United States)

    1993-01-01

    Preliminary Programme The three-day programme features approximately twenty-five invited contributions. Participants may present a poster on the topic "Applications for Industrial Measurements", concerning applied mathematics, software development and computer-based measurements. 20 October Two plenary talks on mathematical methods and metrological applications "Numerical Methods and Modelling" Partial differential equations and integral equations Methods of identification and validation Algorithms for approximation Geometrical shape determination of industrial solids Round Table 21 October "Data Analysis" Spectral analysis and wavelets Calibration of precision instrumentation Comparison measurement of standards Statistical methods in metrology Robust estimation and outliers Applications of the bootstrap method Round Table 22 October (in cooperation with SIMAI and ASP) "Applications for Industrial Measurements" Data acquisition Measurement software, standard computational modules and their validation Round Table Industrial presentations Discussion of poster presentations Conclusions Lecturers Mathematicians from the international metrological community; mathematicians from Italian universities (Politecnico of Torino, Milano, Università di Genova, Milano, Padova, Roma, Trento); scientists and mathematicians from national standards institutes and the Italian National Research Council. The workshop will be of interest to people in universities, research centres and industry who are involved in measurement and need advanced mathematical tools to solve their problems, and to those who work in the development of these mathematical tools. Metrology is concerned with measurement at the highest level of precision. Advances in metrology depend on many factors: improvements in scientific and technical knowledge, instrumentation quality, better use of advanced mathematical tools and the development of new tools. In some countries, metrological institutions have a tradition of

  18. Software-based acoustical measurements

    CERN Document Server

    Miyara, Federico

    2017-01-01

    This textbook provides a detailed introduction to the use of software in combination with simple and economical hardware (a sound level meter with calibrated AC output and a digital recording system) to obtain sophisticated measurements usually requiring expensive equipment. It emphasizes the use of free, open source, and multiplatform software. Many commercial acoustical measurement systems use software algorithms as an integral component; however the methods are not disclosed. This book enables the reader to develop useful algorithms and provides insight into the use of digital audio editing tools to document features in the signal. Topics covered include acoustical measurement principles, in-depth critical study of uncertainty applied to acoustical measurements, digital signal processing from the basics, and metrologically-oriented spectral and statistical analysis of signals. The student will gain a deep understanding of the use of software for measurement purposes; the ability to implement software-based...

  19. Freeform metrology using subaperture stitching interferometry

    Science.gov (United States)

    Supranowitz, Chris; Lormeau, Jean-Pierre; Maloney, Chris; Murphy, Paul; Dumas, Paul

    2016-11-01

    As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input "hitmap" to the deterministic polishing process.

  20. Quantum Metrology in Non-Markovian Environments

    CERN Document Server

    Chin, Alex W; Plenio, Martin B

    2011-01-01

    We analyze optimal bounds for precision spectroscopy in the presence of general, non-Markovian phase noise. We demonstrate that the metrological equivalence of product and maximally entangled states that holds under Markovian dephasing fails in the non-Markovian case. Using an exactly solvable model of a physically realistic finite band-width dephasing environment, we show that the ensuing non-Markovian dynamics enables quantum correlated states to outperform metrological strategies based on uncorrelated states but otherwise identical resources. We show that this conclusion is a direct result of the coherent dynamics of the global state of the system and environment and, as a result, possesses general validity that goes beyond specific models.

  1. Machine tool metrology an industrial handbook

    CERN Document Server

    Smith, Graham T

    2016-01-01

    Maximizing reader insights into the key scientific disciplines of Machine Tool Metrology, this text will prove useful for the industrial-practitioner and those interested in the operation of machine tools. Within this current level of industrial-content, this book incorporates significant usage of the existing published literature and valid information obtained from a wide-spectrum of manufacturers of plant, equipment and instrumentation before putting forward novel ideas and methodologies. Providing easy to understand bullet points and lucid descriptions of metrological and calibration subjects, this book aids reader understanding of the topics discussed whilst adding a voluminous-amount of footnotes utilised throughout all of the chapters, which adds some additional detail to the subject. Featuring an extensive amount of photographic-support, this book will serve as a key reference text for all those involved in the field. .

  2. Compressed quantum metrology for the Ising Hamiltonian

    Science.gov (United States)

    Boyajian, W. L.; Skotiniotis, M.; Dür, W.; Kraus, B.

    2016-12-01

    We show how quantum metrology protocols that seek to estimate the parameters of a Hamiltonian that exhibits a quantum phase transition can be efficiently simulated on an exponentially smaller quantum computer. Specifically, by exploiting the fact that the ground state of such a Hamiltonian changes drastically around its phase-transition point, we construct a suitable observable from which one can estimate the relevant parameters of the Hamiltonian with Heisenberg scaling precision. We then show how, for the one-dimensional Ising Hamiltonian with transverse magnetic field acting on N spins, such a metrology protocol can be efficiently simulated on an exponentially smaller quantum computer while maintaining the same Heisenberg scaling for the squared error, i.e., O (N-2) precision, and derive the explicit circuit that accomplishes the simulation.

  3. Quantum metrology and estimation of Unruh effect.

    Science.gov (United States)

    Wang, Jieci; Tian, Zehua; Jing, Jiliang; Fan, Heng

    2014-11-26

    We study the quantum metrology for a pair of entangled Unruh-Dewitt detectors when one of them is accelerated and coupled to a massless scalar field. Comparing with previous schemes, our model requires only local interaction and avoids the use of cavities in the probe state preparation process. We show that the probe state preparation and the interaction between the accelerated detector and the external field have significant effects on the value of quantum Fisher information, correspondingly pose variable ultimate limit of precision in the estimation of Unruh effect. We find that the precision of the estimation can be improved by a larger effective coupling strength and a longer interaction time. Alternatively, the energy gap of the detector has a range that can provide us a better precision. Thus we may adjust those parameters and attain a higher precision in the estimation. We also find that an extremely high acceleration is not required in the quantum metrology process.

  4. Metrology for fire experiments in outdoor conditions

    CERN Document Server

    Silvani, Xavier

    2013-01-01

    Natural fires can be considered as scale-dependant, non-linear processes of mass, momentum and heat transport, resulting from a turbulent reactive and radiative fluid medium flowing over a complex medium, the vegetal fuel. In natural outdoor conditions, the experimental study of natural fires at real scale needs the development of an original metrology, one able to capture the large range of time and length scales involved in its dynamic nature and also able to resist the thermal, mechanical and chemical aggression of flames on devices. Robust, accurate and poorly intrusive tools must be carefully set-up and used for gaining very fluctuating data over long periods. These signals also need the development of original post-processing tools that take into account the non-steady nature of their stochastic components. Metrology for Fire Experiments in Outdoor Conditions closely analyzes these features, and also describes measurements techniques, the thermal insulation of fragile electronic systems, data acquisitio...

  5. Quantum metrology foundation of units and measurements

    CERN Document Server

    Goebel, Ernst O

    2015-01-01

    The International System of Units (SI) is the world's most widely used system of measurement, used every day in commerce and science, and is the modern form of the metric system. It currently comprises the meter (m), the kilogram (kg), the second (s), the ampere (A), the kelvin (K), the candela (cd) and the mole (mol)). The system is changing though, units and unit definitions are modified through international agreements as the technology of measurement progresses, and as the precision of measurements improves. The SI is now being redefined based on constants of nature and their realization by quantum standards. Therefore, the underlying physics and technologies will receive increasing interest, and not only in the metrology community but in all fields of science. This book introduces and explains the applications of modern physics concepts to metrology, the science and the applications of measurements. A special focus is made on the use of quantum standards for the realization of the forthcoming new SI (the...

  6. Digital holography for MEMS and microsystem metrology

    CERN Document Server

    Asundi, Anand

    2011-01-01

    Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the

  7. Quantum metrology and its application in biology

    Science.gov (United States)

    Taylor, Michael A.; Bowen, Warwick P.

    2016-02-01

    Quantum metrology provides a route to overcome practical limits in sensing devices. It holds particular relevance to biology, where sensitivity and resolution constraints restrict applications both in fundamental biophysics and in medicine. Here, we review quantum metrology from this biological context, focusing on optical techniques due to their particular relevance for biological imaging, sensing, and stimulation. Our understanding of quantum mechanics has already enabled important applications in biology, including positron emission tomography (PET) with entangled photons, magnetic resonance imaging (MRI) using nuclear magnetic resonance, and bio-magnetic imaging with superconducting quantum interference devices (SQUIDs). In quantum metrology an even greater range of applications arise from the ability to not just understand, but to engineer, coherence and correlations at the quantum level. In the past few years, quite dramatic progress has been seen in applying these ideas into biological systems. Capabilities that have been demonstrated include enhanced sensitivity and resolution, immunity to imaging artefacts and technical noise, and characterization of the biological response to light at the single-photon level. New quantum measurement techniques offer even greater promise, raising the prospect for improved multi-photon microscopy and magnetic imaging, among many other possible applications. Realization of this potential will require cross-disciplinary input from researchers in both biology and quantum physics. In this review we seek to communicate the developments of quantum metrology in a way that is accessible to biologists and biophysicists, while providing sufficient details to allow the interested reader to obtain a solid understanding of the field. We further seek to introduce quantum physicists to some of the central challenges of optical measurements in biological science. We hope that this will aid in bridging the communication gap that exists

  8. Quantum metrology and its application in biology

    Energy Technology Data Exchange (ETDEWEB)

    Taylor, Michael A. [Centre for Engineered Quantum Systems, University of Queensland, St Lucia, Queensland 4072 (Australia); Research Institute of Molecular Pathology (IMP), Max F. Perutz Laboratories & Research Platform for Quantum Phenomena and Nanoscale Biological Systems (QuNaBioS), University of Vienna, Dr. Bohr Gasse 7-9, A-1030 Vienna (Austria); Bowen, Warwick P., E-mail: w.bowen@uq.edu.au [Centre for Engineered Quantum Systems, University of Queensland, St Lucia, Queensland 4072 (Australia)

    2016-02-23

    Quantum metrology provides a route to overcome practical limits in sensing devices. It holds particular relevance to biology, where sensitivity and resolution constraints restrict applications both in fundamental biophysics and in medicine. Here, we review quantum metrology from this biological context, focusing on optical techniques due to their particular relevance for biological imaging, sensing, and stimulation. Our understanding of quantum mechanics has already enabled important applications in biology, including positron emission tomography (PET) with entangled photons, magnetic resonance imaging (MRI) using nuclear magnetic resonance, and bio-magnetic imaging with superconducting quantum interference devices (SQUIDs). In quantum metrology an even greater range of applications arise from the ability to not just understand, but to engineer, coherence and correlations at the quantum level. In the past few years, quite dramatic progress has been seen in applying these ideas into biological systems. Capabilities that have been demonstrated include enhanced sensitivity and resolution, immunity to imaging artefacts and technical noise, and characterization of the biological response to light at the single-photon level. New quantum measurement techniques offer even greater promise, raising the prospect for improved multi-photon microscopy and magnetic imaging, among many other possible applications. Realization of this potential will require cross-disciplinary input from researchers in both biology and quantum physics. In this review we seek to communicate the developments of quantum metrology in a way that is accessible to biologists and biophysicists, while providing sufficient details to allow the interested reader to obtain a solid understanding of the field. We further seek to introduce quantum physicists to some of the central challenges of optical measurements in biological science. We hope that this will aid in bridging the communication gap that exists

  9. Interpreting Quantum Discord in Quantum Metrology

    OpenAIRE

    Girolami, Davide

    2015-01-01

    Multipartite quantum systems show properties which do not admit a classical explanation. In particular, even nonentangled states can enjoy a kind of quantum correlations called quantum discord. I discuss some recent results on the role of quantum discord in metrology. Given an interferometric phase estimation protocol where the Hamiltonian is initially unknown to the experimentalist, the quantum discord of the probe state quantifies the minimum precision of the estimation. This provides a phy...

  10. Uterine metrology devices for IUD selection.

    Science.gov (United States)

    1981-11-01

    Accurate measurements of the length of the uterine cavity would make it feasible to select an IUD that is compatible with a given cavity size. Considerable evidence exists to indicate that selecting an IUD on the basis of accurate longitudinal measurements of the uterine cavity improves IUD performance. There are study findings to suggest that as more data are available, specific IUDs can be prescribed for defined ranges of uterine cavity length. Metrology (uterine measuring) devices improve the ability of the clinican to measure accurately longitudinal and, in some instances, lateral dimensions of the uterine cavity. Longitudinal measurements depend on identifying the location of the internal os in order to determine the total length of the cervical canal. Lateral metrology devices also provide a measurement of uterine cavity width. Pain and discomfort associated with the use of the prototype lateral measurement instruments developed thus far is a major deterrent to their wide-scale use. 2 metrology devices -- the Crochet Hook Sound and the Hasson Wing Sound -- are designed to obtain longitudinal measurements of total uterine cavity length and of the length of the cervical canel. 2 new instruments -- the Cavimeter and the Hasson Wing Sound 2 -- designed to obtain both lateral and longitudinal measurements are now available for evaluation. The Hasson Wing Sound appears to be the only uterine metrology device available for service programs that could affect continuation rates of IUD users. It can measure the length of the uterine cavity directly, thus permitting improved IUD selection of individual women or the ability to exclude women who should not be IUD users because of small uterine size. An illustration of the prescriptive approach is included in a table.

  11. 7th International Workshop on Advanced Optical Imaging and Metrology

    CERN Document Server

    2014-01-01

    In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imagi...

  12. Comparisons organized by Ionizing Radiation Metrology Laboratory of FTMC, Lithuania.

    Science.gov (United States)

    Gudelis, A; Gorina, I

    2016-03-01

    The newly established Ionizing Radiation Metrology Laboratory of the National Metrology Institute (FTMC) in Lithuania organized four comparisons in the field of low-level radioactivity measurements in water. For gamma-ray emitters, the activity concentration in the samples was in the range 1-25Bq/kg, while for tritium it was around 2Bq/g. The assigned values of all comparisons were traceable to the primary standards of the Czech Metrology Institute (CMI).

  13. INCREASING METROLOGICAL AUTONOMY OF IN-PLANT MEASURING SYSTEMS

    Directory of Open Access Journals (Sweden)

    Mykola Mykyychuk

    2016-12-01

    Full Text Available The authors offer to solve the problem of providing traceability of measurements by increasing metrological autonomy of in-plant measuring systems. The paper shows the expedience of increasing metrological autonomy by creating a "virtual" reference. There are analysed possible variants of implementation of the "virtual" reference, which will provide high metrological stability of measurements at insignificant additional expenses. The authors point out the necessity of creation of universal technical and programmatic means of mutual comparison for the in-plant measuring systems to increase the reliability of measurements in the conditions of metrological autonomy.

  14. PREFACE: VII Brazilian Congress on Metrology (Metrologia 2013)

    Science.gov (United States)

    Costa-Félix, Rodrigo; Bernardes, Americo; Valente de Oliveira, José Carlos; Mauro Granjeiro, José; Epsztejn, Ruth; Ihlenfeld, Waldemar; Smarçaro da Cunha, Valnei

    2015-01-01

    SEVENTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2013) Metrology and Quality for a Sustainable Development From November 24th to 27th 2013 was issued the Seventh Brazilian Congress on Metrology (Metrologia 2013), which is a biannual conference organized and sponsored by the Brazilian Society of Metrology (SBM) and the Brazilian National Institute of Metrology, Quality and Technology (Inmetro). This edition was held in the charming and historical city of Ouro Preto, MG, Brazil, and aimed to join people and institutions devoted to the dissemination of the metrology and conformity assessment. The Metrologia 2013 Conference consisted of Keynote Speeches (7) and regular papers (204). Among the regular papers, the 47 most outstanding ones, comprising a high quality content on Metrology and Conformity Assessment, were selected to be published in this issue of the Journal of Physics: Conference Series. The topics of the conference covered all important areas of Metrology, which were agglutinated in the following sessions in the present issue: . Physical Metrology (Acoustics, Vibration and Ultrasound; Electricity and Magnetism; Mechanics; Optics); . Metrology on Ionizing Radiations; . Time and Frequency; . Chemistry Metrology; . Materials Metrology; . Biotechnology; . Uncertainty, Statistics and Mathematics; . Legal Metrology; . Conformity Assessment. It is our great pleasure to present this volume of IOP Journal of Physics: Conference Series (JPCS) to the scientific community to promote further research in Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by Metrologia 2013. President of the congress Americo Bernardes Federal University of Ouro Preto atb@iceb.ufop.br Editor-in-chief Rodrigo Costa-Félix Brazilian National Institute of Metrology, Quality and Technology rpfelix@inmetro.gov.br Editors José Carlos Valente de Oliveira (Editor on Mechanical Metrology

  15. Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

    Science.gov (United States)

    Dervilllé, A.; Labrosse, A.; Zimmermann, Y.; Foucher, J.; Gronheid, R.; Boeckx, C.; Singh, A.; Leray, P.; Halder, S.

    2016-03-01

    The dimensional scaling in IC manufacturing strongly drives the demands on CD and defect metrology techniques and their measurement uncertainties. Defect review has become as important as CD metrology and both of them create a new metrology paradigm because it creates a completely new need for flexible, robust and scalable metrology software. Current, software architectures and metrology algorithms are performant but it must be pushed to another higher level in order to follow roadmap speed and requirements. For example: manage defect and CD in one step algorithm, customize algorithms and outputs features for each R&D team environment, provide software update every day or every week for R&D teams in order to explore easily various development strategies. The final goal is to avoid spending hours and days to manually tune algorithm to analyze metrology data and to allow R&D teams to stay focus on their expertise. The benefits are drastic costs reduction, more efficient R&D team and better process quality. In this paper, we propose a new generation of software platform and development infrastructure which can integrate specific metrology business modules. For example, we will show the integration of a chemistry module dedicated to electronics materials like Direct Self Assembly features. We will show a new generation of image analysis algorithms which are able to manage at the same time defect rates, images classifications, CD and roughness measurements with high throughput performances in order to be compatible with HVM. In a second part, we will assess the reliability, the customization of algorithm and the software platform capabilities to follow new specific semiconductor metrology software requirements: flexibility, robustness, high throughput and scalability. Finally, we will demonstrate how such environment has allowed a drastic reduction of data analysis cycle time.

  16. Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?

    Science.gov (United States)

    Postek, Michael T., Jr.; Vladar, Andras E.; Bennett, Marylyn H.

    2002-12-01

    Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers and scanners used in the lithography process, and partly for the lesser need to account for the real three-dimensionality of the mask structures. So, where photomasks are concerned, many of the issues challenging wafer dimensional metrology at 1x are reduced by a factor of 4 or 5 and thus could be temporarily swept aside. This is rapidly changing with the introduction of advanced masks with optical proximity correction and phase shifting features used in 100 nm and smaller circuit generations. Fortunately, photomask metrology generally benefits from the advances made for wafer metrology, but there are still unique issues to be solved in this form of dimensional metrology. It is likely that no single metrology method or tool will ever provide all necessary answers. As with other types of metrology, resolution, sensitivity and linearity in the three-dimensional measurements of the shape of the lines and phase shifting features in general (width, height and wall angles) and the departures from the desired shape (surface and edge roughness, etc.) are the key parameters. Different methods and tools differ in their ability to collect averaged and localized signals with an acceptable speed, but in any case, application of this thorough knowledge of the physics of the given metrology is essential to extract the needed information. This paper will discuss the topics of precision, accuracy and traceability in the SEM metrology of photomasks. Current and possible new techniques utilized in the measurements of photomasks including charge suppression and highly accurate modeling for electron beam metrology will also be explored to answer the question "Has anything really changed?"

  17. DABAM: an open-source database of X-ray mirrors metrology.

    Science.gov (United States)

    Sanchez Del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; Glass, Mark; Idir, Mourad; Metz, Jim; Raimondi, Lorenzo; Rebuffi, Luca; Reininger, Ruben; Shi, Xianbo; Siewert, Frank; Spielmann-Jaeggi, Sibylle; Takacs, Peter; Tomasset, Muriel; Tonnessen, Tom; Vivo, Amparo; Yashchuk, Valeriy

    2016-05-01

    An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.

  18. DABAM: an open-source database of X-ray mirrors metrology

    Science.gov (United States)

    Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; Glass, Mark; Idir, Mourad; Metz, Jim; Raimondi, Lorenzo; Rebuffi, Luca; Reininger, Ruben; Shi, Xianbo; Siewert, Frank; Spielmann-Jaeggi, Sibylle; Takacs, Peter; Tomasset, Muriel; Tonnessen, Tom; Vivo, Amparo; Yashchuk, Valeriy

    2016-01-01

    An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database. PMID:27140145

  19. DABAM: an open-source database of X-ray mirrors metrology

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; Glass, Mark; Idir, Mourad; Metz, Jim; Raimondi, Lorenzo; Rebuffi, Luca; Reininger, Ruben; Shi, Xianbo; Siewert, Frank; Spielmann-Jaeggi, Sibylle; Takacs, Peter; Tomasset, Muriel; Tonnessen, Tom; Vivo, Amparo; Yashchuk, Valeriy

    2016-04-20

    An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.

  20. Metrology for graphene and 2D materials

    Science.gov (United States)

    Pollard, Andrew J.

    2016-09-01

    The application of graphene, a one atom-thick honeycomb lattice of carbon atoms with superlative properties, such as electrical conductivity, thermal conductivity and strength, has already shown that it can be used to benefit metrology itself as a new quantum standard for resistance. However, there are many application areas where graphene and other 2D materials, such as molybdenum disulphide (MoS2) and hexagonal boron nitride (h-BN), may be disruptive, areas such as flexible electronics, nanocomposites, sensing and energy storage. Applying metrology to the area of graphene is now critical to enable the new, emerging global graphene commercial world and bridge the gap between academia and industry. Measurement capabilities and expertise in a wide range of scientific areas are required to address this challenge. The combined and complementary approach of varied characterisation methods for structural, chemical, electrical and other properties, will allow the real-world issues of commercialising graphene and other 2D materials to be addressed. Here, examples of metrology challenges that have been overcome through a multi-technique or new approach are discussed. Firstly, the structural characterisation of defects in both graphene and MoS2 via Raman spectroscopy is described, and how nanoscale mapping of vacancy defects in graphene is also possible using tip-enhanced Raman spectroscopy (TERS). Furthermore, the chemical characterisation and removal of polymer residue on chemical vapour deposition (CVD) grown graphene via secondary ion mass spectrometry (SIMS) is detailed, as well as the chemical characterisation of iron films used to grow large domain single-layer h-BN through CVD growth, revealing how contamination of the substrate itself plays a role in the resulting h-BN layer. In addition, the role of international standardisation in this area is described, outlining the current work ongoing in both the International Organization of Standardization (ISO) and the

  1. Quantum metrology for gravitational wave astronomy.

    Science.gov (United States)

    Schnabel, Roman; Mavalvala, Nergis; McClelland, David E; Lam, Ping K

    2010-11-16

    Einstein's general theory of relativity predicts that accelerating mass distributions produce gravitational radiation, analogous to electromagnetic radiation from accelerating charges. These gravitational waves (GWs) have not been directly detected to date, but are expected to open a new window to the Universe once the detectors, kilometre-scale laser interferometers measuring the distance between quasi-free-falling mirrors, have achieved adequate sensitivity. Recent advances in quantum metrology may now contribute to provide the required sensitivity boost. The so-called squeezed light is able to quantum entangle the high-power laser fields in the interferometer arms, and could have a key role in the realization of GW astronomy.

  2. Evaluation of metrology technologies for free form surfaces

    DEFF Research Database (Denmark)

    Arámbula, K.; Siller, H.R.; De Chiffre, Leonardo

    2012-01-01

    This research work describes a novel approach for comparing different technologies for free form surface metrology: computerized tomography (CT), photogrammetry and coordinate measuring machines (CMM). The comparison has the aim of providing relevant information for the selection of metrology...... also deals with costs issues, required standards, and necessary additional information when selecting inspection equipment....

  3. Evaluation of metrology technologies for free form surfaces

    DEFF Research Database (Denmark)

    Arámbula, K.; Siller, H.R.; De Chiffre, Leonardo

    2012-01-01

    This research work describes a novel approach for comparing different technologies for free form surface metrology: computerized tomography (CT), photogrammetry and coordinate measuring machines (CMM). The comparison has the aim of providing relevant information for the selection of metrology...... also deals with costs issues, required standards, and necessary additional information when selecting inspection equipment....

  4. Primary Laboratory for Dimentional Metrology Annual Report 2000

    DEFF Research Database (Denmark)

    De Chiffre, Leonardo; Rasmussen, Svend Nytoft

    2001-01-01

    The measurement capability concerning different areas within geometrical metrology has been maintained through approximately 1700 calibration and testing tasks for Danish clients.......The measurement capability concerning different areas within geometrical metrology has been maintained through approximately 1700 calibration and testing tasks for Danish clients....

  5. Differential Evolution for Many-Particle Adaptive Quantum Metrology

    NARCIS (Netherlands)

    Lovett, N.B.; Crosnier, C.; Perarnau- Llobet, M.; Sanders, B.

    2013-01-01

    We devise powerful algorithms based on differential evolution for adaptive many-particle quantum metrology. Our new approach delivers adaptive quantum metrology policies for feedback control that are orders-of-magnitude more efficient and surpass the few-dozen-particle limitation arising in methods

  6. Using RF Smart Points for the Improvement of Metrological Activities

    Directory of Open Access Journals (Sweden)

    Claudio de Capua

    2007-03-01

    Full Text Available This work describes the realization of a “radio-frequency identification system” for the improvement of the activities of a metrological laboratory. Some radio-frequency modules, called by the authors RF Smart Points (“radio-frequency smart points”, have been designed to store into their memories all data which are necessary for the instruments tracking (the type of instruments, their identification numbers or serial numbers, the manufacturer, the date when they have been admitted to the installed base of the laboratory, their working state, the elapsed time from the last calibration procedure. The insertion of the data and the inquiry of the instruments are executed by the technical staff of the laboratory through a PDA (Personal Digital Assistant or a PC, which manage the radio-frequency communication by using the RS 232 interface for sending messages to a RF Transceiver. The executable software for managing the communication between the Smart Points and the “PDA/PC-Controllers” is realized in LabVIEW graphical programming environment.

  7. Metrological analysis of the human foot: 3D multisensor exploration

    Science.gov (United States)

    Muñoz Potosi, A.; Meneses Fonseca, J.; León Téllez, J.

    2011-08-01

    In the podiatry field, many of the foot dysfunctions are mainly generated due to: Congenital malformations, accidents or misuse of footwear. For the treatment or prevention of foot disorders, the podiatrist diagnoses prosthesis or specific adapted footwear, according to the real dimension of foot. Therefore, it is necessary to acquire 3D information of foot with 360 degrees of observation. As alternative solution, it was developed and implemented an optical system of threedimensional reconstruction based in the principle of laser triangulation. The system is constituted by an illumination unit that project a laser plane into the foot surface, an acquisition unit with 4 CCD cameras placed around of axial foot axis, an axial moving unit that displaces the illumination and acquisition units in the axial axis direction and a processing and exploration unit. The exploration software allows the extraction of distances on three-dimensional image, taking into account the topography of foot. The optical system was tested and their metrological performances were evaluated in experimental conditions. The optical system was developed to acquire 3D information in order to design and make more appropriate footwear.

  8. METROLOGICAL PERFORMANCE OF SEM 3D TECHNIQUES

    DEFF Research Database (Denmark)

    Marinello, Francesco; Carmignato, Simone; Savio, Enrico;

    2008-01-01

    This paper addresses the metrological performance of three-dimensional measurements performed with Scanning Electron Microscopes (SEMs) using reconstruction of surface topography through stereo-photogrammetry. Reconstruction is based on the model function introduced by Piazzesi adapted for eucent...... condition are studied, in order to define a strategy to optimise the measurements taking account of the critical factors in SEM 3D reconstruction. Investigations were performed on a novel sample, specifically developed and implemented for the tests.......This paper addresses the metrological performance of three-dimensional measurements performed with Scanning Electron Microscopes (SEMs) using reconstruction of surface topography through stereo-photogrammetry. Reconstruction is based on the model function introduced by Piazzesi adapted...... and the instrument set-up; the second concerns the quality of scanned images and represents the major criticality in the application of SEMs for 3D characterizations. In particular the critical role played by the tilting angle and its relative uncertainty, the magnification and the deviations from the eucentricity...

  9. Quantum metrology in non-Markovian environments.

    Science.gov (United States)

    Chin, Alex W; Huelga, Susana F; Plenio, Martin B

    2012-12-07

    We analyze precision bounds for a local phase estimation in the presence of general, non-Markovian phase noise. We demonstrate that the metrological equivalence of product and maximally entangled states that holds under strictly Markovian dephasing fails in the non-Markovian case. Using an exactly solvable model of a physically realistic finite bandwidth dephasing environment, we demonstrate that the ensuing non-Markovian dynamics enables quantum correlated states to outperform metrological strategies based on uncorrelated states using otherwise identical resources. We show that this conclusion is a direct result of the coherent dynamics of the global state of the system and environment and therefore the obtained scaling with the number of particles, which surpasses the standard quantum limit but does not achieve Heisenberg resolution, possesses general validity that goes beyond specific models. This is in marked contrast with the situation encountered under general Markovian noise, where an arbitrarily small amount of noise is enough to restore the scaling dictated by the standard quantum limit.

  10. Cryocooled Josephson standards for AC voltage metrology

    Science.gov (United States)

    Durandetto, P.; Sosso, A.; Monticone, E.; Trinchera, B.; Fretto, M.; Lacquaniti, V.

    2017-05-01

    The Josephson effect is worldwide used as a basis for constant reference voltages in national metrological institutes and in calibration laboratories of industry. Research on Josephson voltage standards is aiming at a fundamental change also in the metrology of the volt for AC and arbitrary waveforms: programmable Josephson voltage standards converting a digital code into a quantum-accurate stepwise waveform are already available in primary laboratories and even more advanced standards for converting sub-nanosecond binary coded pulses into any arbitrary signal with quantum accuracy are now actively developed and tested. A new experimental setup based on a two-stage Gifford-McMahon cryocooler has been developed at INRiM for the operation of AC-Josephson voltage standards. Among its distinct features, the possibility of employing both the aforementioned techniques (programmable and pulsed Josephson voltage standards) is particularly interesting. Quantum-based AC voltage sine waves have been synthesized with both programmable and pulse-driven arrays, although their accuracy is still limited by thermal oscillations due to the cryocooler piston motion.

  11. Metrology of vibration measurements by laser techniques

    Science.gov (United States)

    von Martens, Hans-Jürgen

    2008-06-01

    Metrology as the art of careful measurement has been understood as uniform methodology for measurements in natural sciences, covering methods for the consistent assessment of experimental data and a corpus of rules regulating application in technology and in trade and industry. The knowledge, methods and tools available for precision measurements can be exploited for measurements at any level of uncertainty in any field of science and technology. A metrological approach to the preparation, execution and evaluation (including expression of uncertainty) of measurements of translational and rotational motion quantities using laser interferometer methods and techniques will be presented. The realization and dissemination of the SI units of motion quantities (vibration and shock) have been based on laser interferometer methods specified in international documentary standards. New and upgraded ISO standards are reviewed with respect to their suitability for ensuring traceable vibration measurements and calibrations in an extended frequency range of 0.4 Hz to higher than 100 kHz. Using adequate vibration exciters to generate sufficient displacement or velocity amplitudes, the upper frequency limits of the laser interferometer methods specified in ISO 16063-11 for frequencies procedures (i.e. measurement uncertainty 0.05 % at frequencies <= 10 kHz, <= 1 % up to 100 kHz).

  12. Quantum metrology with unitary parametrization processes.

    Science.gov (United States)

    Liu, Jing; Jing, Xiao-Xing; Wang, Xiaoguang

    2015-02-24

    Quantum Fisher information is a central quantity in quantum metrology. We discuss an alternative representation of quantum Fisher information for unitary parametrization processes. In this representation, all information of parametrization transformation, i.e., the entire dynamical information, is totally involved in a Hermitian operator H. Utilizing this representation, quantum Fisher information is only determined by H and the initial state. Furthermore, H can be expressed in an expanded form. The highlights of this form is that it can bring great convenience during the calculation for the Hamiltonians owning recursive commutations with their partial derivative. We apply this representation in a collective spin system and show the specific expression of H. For a simple case, a spin-half system, the quantum Fisher information is given and the optimal states to access maximum quantum Fisher information are found. Moreover, for an exponential form initial state, an analytical expression of quantum Fisher information by H operator is provided. The multiparameter quantum metrology is also considered and discussed utilizing this representation.

  13. MAMMUT: mirror vibration metrology for VLTI

    Science.gov (United States)

    Spaleniak, Izabela; Giessler, Frank; Geiss, Reinhard; Minardi, Stefano; Pertsch, Thomas; Neuhaeuser, Ralph; Becker, Martin; Rothhardt, Manfred; Delplancke, Françoise; Richichi, Andrea; Ménardi, Serge; Schmid, Christian

    2010-07-01

    MAMMUT (Mirror vibrAtion Metrolology systeM for the Unit Telescope) is an ESO funded feasibility project for the development of a fiber interferometer prototype designed for optical path laser-metrology along the optical train of the Unit Telescopes (UT) of the Very Large Telescope Interferometer (VLTI). Fast mechanical vibrations originating in the VLTI cause fast variations of the optical path difference between two arms of the stellar interferometer, thus reducing the contrast of measured interference fringes. MAMMUT aims at monitoring in real time the optical path variations inside the Coudé train of the UT, for active control purposes. MAMMUT features a 250-meter-long optical fiber which can be used to deliver and inject a laser beam at 1353 nm into the UT. The injected beam can be dropped from the telescope in the Coudé room and interfered with a phase reference, provided by the second 250-meter-long arm of the fiber interferometer. The optical path variations are measured by means of an active homodyne scheme. Coherence between the beam at the injection point and the phase reference is provided by active fiber stabilization, made possible by the implementation of an internal metrology channel in MAMMUT. Here we present the initial laboratory performance results of the MAMMUT prototype, which will be able to sense optical path variations of +/- 5 μm with sub-10 nm precision within a bandwidth of at least 100 Hz.

  14. Optical metrology analysis of the lower jaw deformations.

    Science.gov (United States)

    Tanasić, Ivan; Sojić, Ljiljana Tihacek; Lemić, Aleksandra Milić

    2011-04-01

    New optical stereometric methods based on both contact and noncontact mechanisms for displacement measurement have become common methods in biomechanical behavior research of biomaterials, bone and soft tissue. The aim of this study was to register and measure possible deformations of the lower jaw (mandible) with the intact dental arch using optical metrology method. The system for full field measurement of deformations (strains) comprised of two digital cameras for a synchronized stereoview of the specimen, and the Aramis software. The maximum mandibular bone strains were measured in the regions of the lower first premolar and the lower second molar. In the action force of 500 N simulated in the region of the first lower premolar the intensity of deformation was 86 microm. The value of maximum strain in the bone around the molars was 24 microm for the force of 500 N acting on the second lower molar. When it comes to premolars, 3-5 times stronger deformation was observed in the region of the first lower premolar, compared to the deformation values of the second lower premolar area. Under loading of the applied forces the measured strains were in the elastic deformation area, meanning that the dependence of force and deformity is linear. The highest values of strain measurements obtained by the optical method were found in the jaw bone tissue around the loading teeth, and the bony regions of the triangle and mental region. According to the obtained results from the Aramis processing software it can be concluded that this method is applicable in a variety of biomedical research.

  15. Optical metrology analysis of the lower jaw deformations

    Directory of Open Access Journals (Sweden)

    Tanasić Ivan

    2011-01-01

    Full Text Available Background/Aim. New optical stereometric methods based on both contact and noncontact mechanisms for displacement measurement have become common methods in biomechanical behavior research of biomaterials, bone and soft tissue. The aim of this study was to register and measure possible deformations of the lower jaw (mandible with the intact dental arch using optical metrology method. Methods. The system for full field measurement of deformations (strains comprised of two digital cameras for a synchronized stereoview of the specimen, and the Aramis software. Results. The maximum mandibular bone strains were measured in the regions of the lower first premolar and the lower second molar. In the action force of 500 N simulated in the region of the first lower premolar the intensity of deformation was 86 μm. The value of maximum strain in the bone around the molars was 24 μm for the force of 500 N acting on the second lower molar. When it comes to premolars, 3-5 times stronger deformation was observed in the region of the first lower premolar, compared to the deformation values of the second lower premolar area. Conclusion. Under loading of the applied forces the measured strains were in the elastic deformation area, meanning that the dependence of force and deformity is linear. The highest values of strain measurements obtained by the optical method were found in the jaw bone tissue around the loading teeth, and the bony regions of the triangle and mental region. According to the obtained results from the Aramis processing software it can be concluded that this method is applicable in a variety of biomedical research.

  16. Metrology in physics, chemistry, and biology: differing perceptions.

    Science.gov (United States)

    Iyengar, Venkatesh

    2007-04-01

    The association of physics and chemistry with metrology (the science of measurements) is well documented. For practical purposes, basic metrological measurements in physics are governed by two components, namely, the measure (i.e., the unit of measurement) and the measurand (i.e., the entity measured), which fully account for the integrity of a measurement process. In simple words, in the case of measuring the length of a room (the measurand), the SI unit meter (the measure) provides a direct answer sustained by metrological concepts. Metrology in chemistry, as observed through physical chemistry (measures used to express molar relationships, volume, pressure, temperature, surface tension, among others) follows the same principles of metrology as in physics. The same basis percolates to classical analytical chemistry (gravimetry for preparing high-purity standards, related definitive analytical techniques, among others). However, certain transition takes place in extending the metrological principles to chemical measurements in complex chemical matrices (e.g., food samples), as it adds a third component, namely, indirect measurements (e.g., AAS determination of Zn in foods). This is a practice frequently used in field assays, and calls for additional steps to account for traceability of such chemical measurements for safeguarding reliability concerns. Hence, the assessment that chemical metrology is still evolving.

  17. Advanced applications of scatterometry based optical metrology

    Science.gov (United States)

    Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

    2017-03-01

    The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements

  18. IT Security Standards and Legal Metrology - Transfer and Validation

    Science.gov (United States)

    Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

    2014-08-01

    Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

  19. Ionising radiation metrology for the metallurgical industry

    Directory of Open Access Journals (Sweden)

    García-Toraño E.

    2014-01-01

    Full Text Available Every year millions tons of steel are produced worldwide from recycled scrap loads. Although the detection systems in the steelworks prevent most orphan radioactive sources from entering the furnace, there is still the possibility of accidentally melting a radioactive source. The MetroMetal project, carried out in the frame of the European Metrology Research Programme (EMRP, addresses this problem by studying the existing measurement systems, developing sets of reference sources in various matrices (cast steel, slag, fume dust and proposing new detection instruments. This paper presents the key lines of the project and describes the preparation of radioactive sources as well as the intercomparison exercises used to test the calibration and correction methods proposed within the project.

  20. Traceability and uncertainty estimation in coordinate metrology

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

    2001-01-01

    National and international standards have defined performance verification procedures for coordinate measuring machines (CMMs) that typically involve their ability to measure calibrated lengths and to a certain extent form. It is recognised that, without further analysis or testing, these results...... are insufficient to determine the task specific uncertainty of most measurements. Therefore, performance verification methods defined in current standards do not guarantee traceability of measurements performed with a CMM for all measurement tasks, and procedures for the assessment of task-related uncertainties...... are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

  1. UPWIND 1A2 Metrology. Final Report

    DEFF Research Database (Denmark)

    Eecen, P.J.; Wagenaar, J.W.; Stefanatos, N.

    The UpWind project is a European research project that focuses on the necessary up-scaling of wind energy in 2020. Among the problems that hinder the development of wind energy are measurement problems. For example: to experimentally confirm a theoretical improvement in energy production of a few...... percent of a new design by field experiments is very hard to almost impossible. As long as convincing field tests have not confirmed the actual improvement, the industry will not invest much to change the turbine design. This is an example that clarifies why the development of wind energy is hindered...... by metrology problems (measurement problems). Other examples are in the fields of: • Warranty performance measurements • Improvement of aerodynamic codes • Assessment of wind resources In general terms the uncertainties of the testing techniques and methods are typically much higher than the requirements...

  2. Metrology in arc plasmas - A new cathode

    Science.gov (United States)

    Croche, R.

    1980-02-01

    A new radiating source consisting of an electric arc under argon pressure is described, with power varying between about 0.2 and 1.5 kW, and with the plasma furnishing a continuous spectrum between 115 and 350 nm. The arc functions from 5 to 50 A, with a voltage varying between 30 and 35 V. The cathode of the transfer arc is described in detail, including such advantages as easy igniting of the arc and the possibility of re-sharpening the tip of the cathode. Most important, the new 'knife-shaped' form of the tungsten cathode has improved the stability and reproducibility of the ultraviolet continuum emitted by the plasma of the arc, which is used at the French National Institute of Metrology as a transfer standard of spectral radiance in the vacuum ultraviolet.

  3. Quantum metrology in coarsened measurement reference

    Science.gov (United States)

    Xie, Dong; Xu, Chunling; Wang, An Min

    2017-01-01

    We investigate the role of coarsened measurement reference, which originates from the coarsened reference time and basis, in quantum metrology. When the measurement is based on one common reference basis, the disadvantage of coarsened measurement can be removed by symmetry. Owing to the coarsened reference basis, the entangled state cannot perform better than the product state for a large number of probe particles in estimating the phase. Given a finite uncertainty of the coarsened reference basis, the optimal number of probe particles is obtained. Finally, we prove that the maximally entangled state always achieves better frequency precision in the case of non-Markovian dephasing than that in the case of Markovian dephasing. The product state is more resistant to the interference of the coarsened reference time than the entangled state.

  4. Ultimate precision of adaptive quantum metrology

    CERN Document Server

    Pirandola, Stefano

    2016-01-01

    We consider the problem of estimating a classical parameter encoded in a quantum channel, assuming the most general strategy allowed by quantum mechanics. This strategy is based on the exploitation of an unlimited amount of pre-shared entanglement plus the use of adaptive probings, where the input of the channel is interactively updated during the protocol. We show that, for the wide class of teleportation-stretchable channels in finite dimension, including all Pauli channels and erasure channels, the quantum Fisher information cannot exceed an ultimate bound given by the Choi matrix of the encoding channel. We also extend our methods and results to quantum channel discrimination, finding a corresponding ultimate bound for the minimum error probability. Thus, our findings establish the ultimate precision limits that are achievable in quantum metrology and quantum discrimination for the most basic models of discrete-variable quantum channels.

  5. Coordinate metrology accuracy of systems and measurements

    CERN Document Server

    Sładek, Jerzy A

    2016-01-01

    This book focuses on effective methods for assessing the accuracy of both coordinate measuring systems and coordinate measurements. It mainly reports on original research work conducted by Sladek’s team at Cracow University of Technology’s Laboratory of Coordinate Metrology. The book describes the implementation of different methods, including artificial neural networks, the Matrix Method, the Monte Carlo method and the virtual CMM (Coordinate Measuring Machine), and demonstrates how these methods can be effectively used in practice to gauge the accuracy of coordinate measurements. Moreover, the book includes an introduction to the theory of measurement uncertainty and to key techniques for assessing measurement accuracy. All methods and tools are presented in detail, using suitable mathematical formulations and illustrated with numerous examples. The book fills an important gap in the literature, providing readers with an advanced text on a topic that has been rapidly developing in recent years. The book...

  6. Applications of surface metrology in firearm identification

    Science.gov (United States)

    Zheng, X.; Soons, J.; Vorburger, T. V.; Song, J.; Renegar, T.; Thompson, R.

    2014-01-01

    Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCFMAX) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases.

  7. Hybrid enabled thin film metrology using XPS and optical

    Science.gov (United States)

    Vaid, Alok; Iddawela, Givantha; Mahendrakar, Sridhar; Lenahan, Michael; Hossain, Mainul; Timoney, Padraig; Bello, Abner F.; Bozdog, Cornel; Pois, Heath; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Kang, Byung Cheol; Isbester, Paul; Sendelbach, Matthew; Yellai, Naren; Dasari, Prasad; Larson, Tom

    2016-03-01

    Complexity of process steps integration and material systems for next-generation technology nodes is reaching unprecedented levels, the appetite for higher sampling rates is on the rise, while the process window continues to shrink. Current thickness metrology specifications reach as low as 0.1A for total error budget - breathing new life into an old paradigm with lower visibility for past few metrology nodes: accuracy. Furthermore, for advance nodes there is growing demand to measure film thickness and composition on devices/product instead of surrogate planar simpler pads. Here we extend our earlier work in Hybrid Metrology to the combination of X-Ray based reference technologies (high performance) with optical high volume manufacturing (HVM) workhorse metrology (high throughput). Our stated goal is: put more "eyes" on the wafer (higher sampling) and enable move to films on pattern structure (control what matters). Examples of 1X front-end applications are used to setup and validate the benefits.

  8. Preparation and Characterisation of Exfoliated Graphene for Quantum Resistance Metrology

    NARCIS (Netherlands)

    Rietveld, G.; Elferen, H.J. van; Giesbers, A.J.M.; Veligura, A.; Zeitler, U.; Novoselov, K.S.; Wees, B.J. van; Geim, A.K.; Maan, J.C.

    2010-01-01

    Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.

  9. Optical Fabrication and Metrology of Aspheric and Freeform Mirrors Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The requirement for cost effective manufacturing and metrology of large optical surfaces is instrumental for the success of future NASA programs such as LISA, WFIRST...

  10. Towards Photonics Enabled Quantum Metrology of Temperature, Pressure and Vacuum

    CERN Document Server

    Ahmed, Zeeshan; Douglass, Kevin; Fedchak, Jim; Scherschligt, Julia; Hendricks, Jay; Ricker, Jacob; Strouse, Gregory

    2016-01-01

    This chapter presents a brief overview of photonic sensor and standards development that is currently undergoing in the thermodynamic metrology group at NIST in the areas of temperature, pressure, vacuum and time-resolved pressure measurements.

  11. Optical vortex metrology for non-destructive testing

    DEFF Research Database (Denmark)

    Wang, W.; Hanson, Steen Grüner

    2009-01-01

    Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis.......Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis....

  12. Using grating based X-ray contrast modalities for metrology

    DEFF Research Database (Denmark)

    Angel, Jais Andreas Breusch; Lauridsen, T.; Feidenhans'l, R.

    2014-01-01

    Traditionally, segmentation between multi-materials in CT is only available for cases, where material densities are not close to each other. A novel method called GBI offers a new possibility to overcome this problem, and was evaluated with respect to its metrological performance by comparisons...... to traceable measurements. The measurement results show that further development related to stability issues on the used CT is needed to create a metrological tool using GBI....

  13. Consultative committee on ionizing radiation: Impact on radionuclide metrology.

    Science.gov (United States)

    Karam, L R; Ratel, G

    2016-03-01

    In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM's consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence.

  14. Advances in the atomic force microscopy for critical dimension metrology

    Science.gov (United States)

    Hussain, Danish; Ahmad, Khurshid; Song, Jianmin; Xie, Hui

    2017-01-01

    Downscaling, miniaturization and 3D staking of the micro/nano devices are burgeoning phenomena in the semiconductor industry which have posed sophisticated challenges in the critical dimension (CD) metrology. Over the past few years, atomic force microscopy (AFM) has emerged as an important CD metrology technique in meeting these challenges because of its high accuracy, 3D imaging capability, high spatial resolution and non-destructive nature. In this article, advances in the AFM based critical dimension (CD) metrology are systematically reviewed and discussed. CD metrology AFM techniques, strengths, limitations and scanning algorithms are described. Developments towards accurate measurements such as creep and hysteresis compensation of the piezoelectric scanners, their calibration and tip characterization are discussed. In addition, image reconstruction and measures for achieving high accuracy CD measurements with hybrid metrology technique are also discussed. CD metrology challenges offered by the next generation lithography (NGL) techniques such as those associated with the 3D nanodevices of 10 nm node and beyond have been highlighted.

  15. Metrology in electricity and magnetism: EURAMET activities today and tomorrow

    Science.gov (United States)

    Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

    2017-10-01

    Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

  16. Metrology of Large Parts. Chapter 5

    Science.gov (United States)

    Stahl, H. Philip

    2012-01-01

    As discussed in the first chapter of this book, there are many different methods to measure a part using optical technology. Chapter 2 discussed the use of machine vision to measure macroscopic features such as length and position, which was extended to the use of interferometry as a linear measurement tool in chapter 3, and laser or other trackers to find the relation of key points on large parts in chapter 4. This chapter looks at measuring large parts to optical tolerances in the sub-micron range using interferometry, ranging, and optical tools discussed in the previous chapters. The purpose of this chapter is not to discuss specific metrology tools (such as interferometers or gauges), but to describe a systems engineering approach to testing large parts. Issues such as material warpage and temperature drifts that may be insignificant when measuring a part to micron levels under a microscope, as will be discussed in later chapters, can prove to be very important when making the same measurement over a larger part. In this chapter, we will define a set of guiding principles for successfully overcoming these challenges and illustrate the application of these principles with real world examples. While these examples are drawn from specific large optical testing applications, they inform the problems associated with testing any large part to optical tolerances. Manufacturing today relies on micrometer level part performance. Fields such as energy and transportation are demanding higher tolerances to provide increased efficiencies and fuel savings. By looking at how the optics industry approaches sub-micrometer metrology, one can gain a better understanding of the metrology challenges for any larger part specified to micrometer tolerances. Testing large parts, whether optical components or precision structures, to optical tolerances is just like testing small parts, only harder. Identical with what one does for small parts, a metrologist tests large parts and optics

  17. Welcome to Surface Topography: Metrology and Properties

    Science.gov (United States)

    Leach, Richard

    2013-11-01

    I am delighted to welcome readers to this inaugural issue of Surface Topography: Metrology and Properties (STMP). In these days of citation indexes and academic reviews, it is a tough, and maybe a brave, job to start a new journal. But the subject area has never been more active and we are seeing genuine breakthroughs in the use of surfaces to control functional performance. Most manufactured parts rely on some form of control of their surface characteristics. The surface is usually defined as that feature on a component or device, which interacts with either the environment in which it is housed (or in which the device operates), or with another surface. The surface topography and material characteristics of a part can affect how fluids interact with it, how the part looks and feels and how two bearing parts will slide together. The need to control, and hence measure, surface features is becoming increasingly important as we move into a miniaturized world. Surface features can become the dominant functional features of a part and may become large in comparison to the overall size of an object. Research into surface texture measurement and characterization has been carried out for over a century and is now more active than ever, especially as new areal surface texture specification standards begin to be introduced. The range of disciplines for which the function of a surface relates to its topography is very diverse; from metal sheet manufacturing to art restoration, from plastic electronics to forensics. Until now, there has been no obvious publishing venue to bring together all these applications with the underlying research and theory, or to unite those working in academia with engineering and industry. Hence the creation of Surface Topography: Metrology and Properties . STMP will publish the best work being done across this broad discipline in one journal, helping researchers to share common themes and highlighting and promoting the extraordinary benefits this

  18. Traceable quantum sensing and metrology relied up a quantum electrical triangle principle

    Science.gov (United States)

    Fang, Yan; Wang, Hengliang; Yang, Xinju; Wei, Jingsong

    2016-11-01

    Hybrid quantum state engineering in quantum communication and imaging1-2 needs traceable quantum sensing and metrology, which are especially critical to quantum internet3 and precision measurements4 that are important across all fields of science and technology-. We aim to set up a mode of traceable quantum sensing and metrology. We developed a method by specially transforming an atomic force microscopy (AFM) and a scanning tunneling microscopy (STM) into a conducting atomic force microscopy (C-AFM) with a feedback control loop, wherein quantum entanglement enabling higher precision was relied upon a set-point, a visible light laser beam-controlled an interferometer with a surface standard at z axis, diffractometers with lateral standards at x-y axes, four-quadrant photodiode detectors, a scanner and its image software, a phase-locked pre-amplifier, a cantilever with a kHz Pt/Au conducting tip, a double barrier tunneling junction model, a STM circuit by frequency modulation and a quantum electrical triangle principle involving single electron tunneling effect, quantum Hall effect and Josephson effect5. The average and standard deviation result of repeated measurements on a 1 nm height local micro-region of nanomedicine crystal hybrid quantum state engineering surface and its differential pA level current and voltage (dI/dV) in time domains by using C-AFM was converted into an international system of units: Siemens (S), an indicated value 0.86×10-12 S (n=6) of a relative standard uncertainty was superior over a relative standard uncertainty reference value 2.3×10-10 S of 2012 CODADA quantized conductance6. It is concluded that traceable quantum sensing and metrology is emerging.

  19. Metrology Of Silicide Contacts For Future CMOS

    Science.gov (United States)

    Zollner, Stefan; Gregory, Richard B.; Kottke, M. L.; Vartanian, Victor; Wang, Xiang-Dong; Theodore, David; Fejes, P. L.; Conner, J. R.; Raymond, Mark; Zhu, Xiaoyan; Denning, Dean; Bolton, Scott; Chang, Kyuhwan; Noble, Ross; Jahanbani, Mohamad; Rossow, Marc; Goedeke, Darren; Filipiak, Stan; Garcia, Ricardo; Jawarani, Dharmesh; Taylor, Bill; Nguyen, Bich-Yen; Crabtree, P. E.; Thean, Aaron

    2007-09-01

    Silicide materials (NiSi, CoSi2, TiSi2, etc) are used to form low-resistance contacts between the back-end (W plugs and Cu interconnects) and front-end portions (silicon source, drain, and gate regions) of integrated CMOS circuits. At the 65 nm node, a transition from CoSi2 to NiSi was necessary because of the unique capability of NiSi to form narrow silicide nanowires on active (monocrystalline) and gate (polycrystalline) lines. Like its predecessors TiSi2 and CoSi2, NiSi is a mid-gap silicide, i.e., the Fermi level of the NiSi metal is pinned half-way between the conduction and valence band edges in silicon. This leads to a Schottky barrier between the silicide and silicon source-drain regions, which creates undesirable parasitic resistances. For future CMOS generations, band-edge silicides, such as PtSi for contacts to p-type or rare earth silicides for contacts to n-type Si will be needed. This paper reviews metrology and characterization techniques for NiSi process control for development and manufacturing, with special emphasis on x-ray reflectance and x-ray fluorescence. We also report measurement methods useful for development of a PtSi PMOS module.

  20. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  1. Hierarchical characterization procedures for dimensional metrology

    Science.gov (United States)

    MacKinnon, David; Beraldin, Jean-Angelo; Cournoyer, Luc; Carrier, Benjamin

    2011-03-01

    We present a series of dimensional metrology procedures for evaluating the geometrical performance of a 3D imaging system that have either been designed or modified from existing procedures to ensure, where possible, statistical traceability of each characteristic value from the certified reference surface to the certifying laboratory. Because there are currently no internationally-accepted standards for characterizing 3D imaging systems, these procedures have been designed to avoid using characteristic values provided by the vendors of 3D imaging systems. For this paper, we focus only on characteristics related to geometric surface properties, dividing them into surface form precision and surface fit trueness. These characteristics have been selected to be familiar to operators of 3D imaging systems that use Geometrical Dimensioning and Tolerancing (GD&T). The procedures for generating characteristic values would form the basis of either a volumetric or application-specific analysis of the characteristic profile of a 3D imaging system. We use a hierarchical approach in which each procedure builds on either certified reference values or previously-generated characteristic values. Starting from one of three classes of surface forms, we demonstrate how procedures for quantifying for flatness, roundness, angularity, diameter error, angle error, sphere-spacing error, and unidirectional and bidirectional plane-spacing error are built upon each other. We demonstrate how these procedures can be used as part of a process for characterizing the geometrical performance of a 3D imaging system.

  2. Relativistic quantum metrology in open system dynamics.

    Science.gov (United States)

    Tian, Zehua; Wang, Jieci; Fan, Heng; Jing, Jiliang

    2015-01-22

    Quantum metrology studies the ultimate limit of precision in estimating a physical quantity if quantum strategies are exploited. Here we investigate the evolution of a two-level atom as a detector which interacts with a massless scalar field using the master equation approach for open quantum system. We employ local quantum estimation theory to estimate the Unruh temperature when probed by a uniformly accelerated detector in the Minkowski vacuum. In particular, we evaluate the Fisher information (FI) for population measurement, maximize its value over all possible detector preparations and evolution times, and compare its behavior with that of the quantum Fisher information (QFI). We find that the optimal precision of estimation is achieved when the detector evolves for a long enough time. Furthermore, we find that in this case the FI for population measurement is independent of initial preparations of the detector and is exactly equal to the QFI, which means that population measurement is optimal. This result demonstrates that the achievement of the ultimate bound of precision imposed by quantum mechanics is possible. Finally, we note that the same configuration is also available to the maximum of the QFI itself.

  3. Nanomanufacturing metrology for cellulosic nanomaterials: an update

    Science.gov (United States)

    Postek, Michael T.

    2014-08-01

    The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, wood-based nanotechnology) is imperative to the success of this rising economic sector. Wood-based nanotechnology is a revolutionary technology that will create new jobs and strengthen America's forest-based economy through industrial development and expansion. It allows this, previously perceived, low-tech industry to leap-frog directly into high-tech products and processes and thus improves its current economic slump. Recent global investments in nanotechnology programs have led to a deeper appreciation of the high performance nature of cellulose nanomaterials. Cellulose, manufactured to the smallest possible-size ( 2 nm x 100 nm), is a high-value material that enables products to be lighter and stronger; have less embodied energy; utilize no catalysts in the manufacturing, are biologically compatible and, come from a readily renewable resource. In addition to the potential for a dramatic impact on the national economy - estimated to be as much as $250 billion worldwide by 2020 - cellulose-based nanotechnology creates a pathway for expanded and new markets utilizing these renewable materials. The installed capacity associated with the US pulp and paper industry represents an opportunity, with investment, to rapidly move to large scale production of nano-based materials. However, effective imaging, characterization and fundamental measurement science for process control and characterization are lacking at the present time. This talk will discuss some of these needed measurements and potential solutions.

  4. Developments in remote metrology at JET

    Energy Technology Data Exchange (ETDEWEB)

    Mindham, T.J., E-mail: tim.mindham@ccfe.ac.uk [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Sandford, G.C.; Hermon, G. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Belcher, C. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Oxford Technologies Ltd., 7 Nuffield Way, Abingdon, OX14 1RJ (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Pace, N. [JET-EFDA, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); Babcock Nuclear Division, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom); CCFE, Culham Science Centre, Abingdon, OX14 3DB (United Kingdom)

    2011-10-15

    The need to maximise the operational availability of fusion devices has driven the enhancements in accuracy, flexibility and speed associated with the inspection techniques used at JET. To this end, the remote installation of the ITER-Like Wall (ILW) tiles, conduits and embedded diagnostics has necessitated the adoption of technologies from other industries for their use in conjunction with the JET Remote Handling (RH) system. The novel adaptation of targetless stereophotogrammetry, targeted single-camera photogrammetry and gap measurement techniques for remote applications has prompted a range of challenges and lessons learnt both from the design process and operational experience. Interfacing Commercial Off-The-Shelf (COTS) components with the existing RH equipment has highlighted several issues of relevance to the developing ITER RH system. This paper reports results from the stereophotogrammetry and the single-camera photogrammetry surveys, allowing analysis of the effectiveness of the RH system as a platform for in-vessel measurement. This includes scrutiny of the accuracy achieved with each technique as well as the impact on the in-vessel Configuration Management Model (CMM). The paper concludes with a summary of key recommendations for the ITER RH system based on the experience of remote metrology at JET.

  5. Advanced overlay analysis through design based metrology

    Science.gov (United States)

    Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro

    2015-03-01

    As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.

  6. Mueller matrix imaging ellipsometry for nanostructure metrology.

    Science.gov (United States)

    Liu, Shiyuan; Du, Weichao; Chen, Xiuguo; Jiang, Hao; Zhang, Chuanwei

    2015-06-29

    In order to achieve effective process control, fast, inexpensive, nondestructive and reliable nanometer scale feature measurements are extremely useful in high-volume nanomanufacturing. Among the possible techniques, optical scatterometry is relatively ideal due to its high throughput, low cost, and minimal sample damage. However, this technique is inherently limited by the illumination spot size of the instrument and the low efficiency in construction of a map of the sample over a wide area. Aiming at these issues, we introduce conventional imaging techniques to optical scatterometry and combine them with Mueller matrix ellipsometry based scatterometry, which is expected to be a powerful tool for the measurement of nanostructures in future high-volume nanomanufacturing, and propose to apply Mueller matrix imaging ellipsometry (MMIE) for nanostructure metrology. Two kinds of nanostructures were measured using an in-house developed Mueller matrix imaging ellipsometer in this work. The experimental results demonstrate that we can achieve Mueller matrix measurement and analysis for nanostructures with pixel-sized illumination spots by using MMIE. We can also efficiently construct parameter maps of the nanostructures over a wide area with pixel-sized lateral resolution by performing parallel ellipsometric analysis for all the pixels of interest.

  7. Metrology Sampling Strategies for Process Monitoring Applications

    KAUST Repository

    Vincent, Tyrone L.

    2011-11-01

    Shrinking process windows in very large scale integration semiconductor manufacturing have already necessitated the development of control systems capable of addressing sub-lot-level variation. Within-wafer control is the next milestone in the evolution of advanced process control from lot-based and wafer-based control. In order to adequately comprehend and control within-wafer spatial variation, inline measurements must be performed at multiple locations across the wafer. At the same time, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed using the standard statistical tools of principle component analysis and canonical correlation analysis. The proposed selection method is validated using real manufacturing data, and results indicate that it is possible to significantly reduce the number of measurements with little loss in the information obtained for the process control systems. © 2011 IEEE.

  8. State-of-the-art attosecond metrology

    Energy Technology Data Exchange (ETDEWEB)

    Schultze, M., E-mail: martin.schultze@mpq.mpg.de [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermann-Str. 1, D-85748 Garching (Germany); Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany); Wirth, A.; Grguras, I.; Uiberacker, M.; Uphues, T.; Verhoef, A.J.; Gagnon, J. [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermann-Str. 1, D-85748 Garching (Germany); Hofstetter, M.; Kleineberg, U. [Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany); Goulielmakis, E. [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermann-Str. 1, D-85748 Garching (Germany); Krausz, F. [Max-Planck-Institut fuer Quantenoptik, Hans-Kopfermann-Str. 1, D-85748 Garching (Germany); Department fuer Physik, Ludwig-Maximilians-Universitaet, Am Coulombwall 1, D-85748 Garching (Germany)

    2011-04-15

    Research highlights: {yields} We present a complete setup for investigations with attosecond temporal resoultion. {yields} Few-cycle visible laser pulses are used to generate xray pulses approaching the atomic unit of time. {yields} Attosecond XUV pulses explore ultrafast electronic dynamics in atoms. - Abstract: Tracking and controlling electron dynamics in the interior of atoms, molecules as well as in solids is at the forefront of modern ultrafast science . Time-resolved studies of these dynamics require attosecond temporal resolution that is provided by an ensemble of techniques consolidated under the term 'attosecond metrology'. This work reports the development and commissioning of what we refer to as next-generation attosecond beamline technology: the AS-1 attosecond beamline at the Max-Planck Institute of Quantum Optics. It consists of a phase-stabilized few-cycle laser system, for the generation of XUV radiation, and modules tailored for the spectral filtering and isolation of attosecond pulses as well as for their temporal characterization. The setup produces the shortest attosecond pulses demonstrated to date and combines them with advanced spectroscopic instrumentation (electron-, ion- and XUV-spectrometers). These pulses serve as temporally confined trigger events (attosecond streaking and tunneling spectroscopy) or probe pulses (attosecond absorption and photoelectron spectroscopy) enabling attosecond chronoscopy to be applied to a broad range of systems belonging to the microcosm.

  9. OPC aware mask and wafer metrology

    Science.gov (United States)

    Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik M.; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt G.; England, Jonathan G.; Howard, William B.

    2002-08-01

    Lithography at its limit of resolution is a highly non- linear pattern transfer process. Typically the shapes of printed features deviate considerably from their corresponding features in the layout. This deviation is known as Optical Proximity Effect, and its correction Optical Proximity effect Correction or OPC. Although many other so-called optical enhancement technologies are applied to cope with the issues of lithography at its limit of resolution, almost none of these can re-store the linearity of the pattern transfer. Hence fully functional OPC has become a very basic requirement for current and future lithography processes. In general, proximity effects are two-dimensional (2d) effects. Thus any measurement of proximity effects or any characterization of the effectiveness of OPC has to be two- dimensional. As OPC modifies shapes in the data for mask writing in a way to compensate for the expected proximity effects of the following processing steps, parameters describing the particular OPC-mask quality is a major concern. One-dimensional mask specifications, such as linewidth mean-to-target and uniformity, pattern placement, and maximum size of a tolerable defect, are not sufficient anymore to completely describe the functionality of a given mask for OPC. Two-dimensional mask specifications need to be evaluated. We present in this paper a basic concept for 2d metrology. Examples for 2d measurements to assess the effectiveness of OPC are given by the application of an SEM Image Analysis tool to an advanced 130nm process.

  10. Desarrollo de herramientas para evaluaciones ópticas y guía de introducción al laboratorio de metrología de paneles

    OpenAIRE

    2012-01-01

    Trabajo realizado para mejorar el proceso de evaluación de paneles para receptores de televisión mediante un software de medida automática. [ANGLÈS] The target of this project is the development of software tools for optical evaluation of display panels (and/or television devices) in the Display Metrology Lab at Sony R&D facilities in Viladecavalls. The core of this software is a command console ready to parse scripts containing instructions for several cameras and generator used for the o...

  11. Software engineering

    CERN Document Server

    Sommerville, Ian

    2010-01-01

    The ninth edition of Software Engineering presents a broad perspective of software engineering, focusing on the processes and techniques fundamental to the creation of reliable, software systems. Increased coverage of agile methods and software reuse, along with coverage of 'traditional' plan-driven software engineering, gives readers the most up-to-date view of the field currently available. Practical case studies, a full set of easy-to-access supplements, and extensive web resources make teaching the course easier than ever.

  12. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  13. Why should we apply more metrological knowledge to field measurements?

    Science.gov (United States)

    Buchholz, B.; Kraemer, M.; Rolf, C.; Wagner, S.; Zondlo, M. A.; Ebert, V.

    2016-12-01

    Metrology, the science of measurement, defines the SI, the international system of measurement units, their realization and aims to provide a traceable linkage of measurements to the SI. Primary standards at the national metrology institutes (NMIs) provide the highest achievable accuracy levels linked to the SI and thus are ideal scale reference points to establish long-term comparability between instruments in large networks e.g. in global atmospheric monitoring. However, NMIs offer much more than traceable standards. Metrological communities share internally a large valuable knowledge about "how to measure", e.g. how to calculate, assess and estimate impacts which deteriorate measurements or how to minimize negative impacts and address them in a systematic way with a scientific approach. Over the last years WMO, the world meteorological organization, as well as sub communities in the environmental sciences (e.g. the TCCON or GRUAN network), have greatly increased their efforts to integrate metrological principles and improved the comparability across the network. Prominent examples are airborne water vapor measurements, which, despite the well validated global metrological water scale for industry applications, are only very rarely linked to it, mainly due to the lack of established transfer standards. During the last years our group at PTB developed a new class of optical hygrometers and related validation strategies, in order to reduce deviations of up to 20% found in AquaVIT, a large scale, lab based comparison of leading airborne field hygrometers (Fahey et al, AMT, 7, 3159-3251, 2014) down to a long-term stability over 18 month of 0.35%, making this instrument (SEALDH-II) the first dTDLAS-based airborne transfer standards for atmospheric humidity. These and other examples lead to the conclusion that scientific communities starting to enroll metrological principles significantly improve their measurements and eventually the validity as well as interpretation

  14. Quantum metrology from a quantum information science perspective

    CERN Document Server

    Toth, Geza

    2015-01-01

    We summarise important recent advances in quantum metrology, in connection to experiments in cold gases, trapped cold atoms and photons. First we review simple metrological setups, such as quantum metrology with spin squeezed states, with Greenberger-Horne-Zeilinger states, Dicke states and singlet states. We calculate the highest precision achievable in these schemes. Then, we present the fundamental notions of quantum metrology, such as shot-noise scaling, Heisenberg scaling, the quantum Fisher information and the Cramer-Rao bound. Using these, we demonstrate that entanglement is needed to surpass the shot-noise scaling in very general metrological tasks with a linear interferometer. We discuss some applications of the quantum Fisher information, such as how it can be used to obtain a criterion for a quantum state to be a macroscopic superposition. We show how it is related to the the speed of a quantum evolution, and how it appears in the theory of the quantum Zeno effect. Finally, we explain how uncorrela...

  15. [The EFS metrology: From the production to the reason].

    Science.gov (United States)

    Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

    2014-06-01

    In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level.

  16. The Development of a Deflectometer for Accurate Surface Figure Metrology

    Science.gov (United States)

    Gubarev, Mikhail; Eberhardt, Andrew; Ramsey, Brian; Atkins, Carolyn

    2015-01-01

    Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication

  17. Introduction to quantum metrology quantum standards and instrumentation

    CERN Document Server

    Nawrocki, Waldemar

    2015-01-01

    This book presents the theory of quantum effects used in metrology and results of the author’s own research in the field of quantum electronics. The book provides also quantum measurement standards used in many branches of metrology for electrical quantities, mass, length, time and frequency. This book represents the first comprehensive survey of quantum metrology problems. As a scientific survey, it propagates a new approach to metrology with more emphasis on its connection with physics. This is of importance for the constantly developing technologies and nanotechnologies in particular. Providing a presentation of practical applications of the effects used in quantum metrology for the construction of quantum standards and sensitive electronic components, the book is useful for a wide audience of physicists and metrologists in the broad sense of both terms. In 2014 a new system of units, the so called  Quantum SI, is introduced. This book helps to understand and approve the new system to both technology a...

  18. Optical metrology: from the laboratory to the real world

    Science.gov (United States)

    Osten, W.; Garbusi, E.; Fleischle, D.; Lyda, W.; Pruss, C.; Reichle, R.; Falldorf, C.

    2010-09-01

    Optical metrology has shown to be a versatile tool for the solution of many inspection problems. The main advantages of optical methods are the noncontact nature, the non-destructive and fieldwise working principle, the fast response, high sensitivity, resolution and accuracy. Consequently, optical principles are increasingly being considered in all steps of the evolution of modern products. However, the step out of the laboratory into the harsh environment of the factory floor was and is a big challenge for optical metrology. The advantages mentioned above must be paid often with strict requirements concerning the measurement conditions and the object under test. For instance, the request for interferometric precision in general needs an environment where high stability is guaranteed. If this cannot be satisfied to a great extent special measures have to be taken or compromises have to be accepted. But the rapid technological development of the components that are used for creating modern optical measurement systems, the unrestrained growth of the computing power and the implementation of new measurement and inspection strategies give cause for optimism and show that the high potential of optical metrology is far from being fully utilized. In this article current challenges to optical metrology are discussed and new technical improvements that help to overcome existing restrictions are treated. On example of selected applications the progress in bringing optical metrology to the real world is shown.

  19. Forensic Metrology: Its Importance and Evolution in the United States

    Science.gov (United States)

    Vosk, JD Ted

    2016-11-01

    Forensic measurements play a significant role in the U.S. criminal justice system. Guilt or innocence, or the severity of a sentence, may depend upon the results of such measurements. Until recently, however, forensic disciplines were largely unaware of the field of metrology. Accordingly, proper measurement practices were often, and widely, neglected. These include failure to adopt proper calibration techniques, establish the traceability of results and determine measurement uncertainty. These failures undermine confidence in verdicts based upon forensic measurements. Over the past decade, though, the forensic sciences have been introduced to metrology and its principles leading to more reliable measurement practices. The impetus for this change was driven by many forces. Pressure came initially from criminal defense lawyers challenging metrologically unsound practices and results relied upon by government prosecutions. Litigation in the State of Washington led this movement spurring action by attorneys in other jurisdictions and eventually reform in the measurement practices of forensic labs around the country. Since then, the greater scientific community, other forensic scientists and even prosecutors have joined the fight. This paper describes the fight to improve the quality of justice by the application of metrological principles and the evolution of the field of forensic metrology.

  20. Monitoring climate from space: a metrology perspective

    Science.gov (United States)

    Revercomb, Hank; Best, Fred; Tobin, Dave; Knuteson, Bob; Smith, Nadia; Smith, William L.; Weisz, Elisabeth

    2016-05-01

    Application of the principles of metrology for the NASA Climate Absolute Radiance and Refractivity Observatory (CLARREO) infrared high spectral resolution measurements is presented, starting with the use of a Standard International (SI) reference source on orbit, developing uncertainty traceability for intercalibration to other spaceborne sensors, and finally tracing the direct effects of radiance uncertainty on climate products originating from state parameter retrievals. The Absolute Radiance Interferometer (ARI) IR prototype employs an On-orbit Absolute Radiance Standard (OARS), developed under the NASA Instrument Incubator Program for CLARREO, for on-orbit calibration verification to better than 0.1 K 3-sigma. The OARS consists of a variable temperature, high emissivity blackbody with temperature calibration established to better than 16 mK on-orbit and provision for on-orbit emissivity monitoring. The temperature scale is established using miniature melt cells of Ga, H2O, and Hg. Transferring the high accuracy of ARI measurements to other IR instruments, especially the high spectral resolution operational sounders (AIRS, CrIS and IASI), is an important objective of CLARREO. The mathematical approach to rigorous traceability of sampling uncertainties is explained and applied in simulations of the intercalibration process. Results show that it will be possible to make intercomparisons of better than 0.05 K 3-sigma with just 6 months of observations from a single CLARREO in true polar orbit. Finally, the effects of radiance perturbations representing realistic uncertainties (for the CrIS on Suomi NPP) on retrieved temperature and water vapor profiles are evaluated. The results demonstrate a stable, physically reasonable impact of Dual regression retrievals.

  1. Dynamic Length Metrology (DLM) for measurements with sub-micrometre uncertainty in a production environment

    DEFF Research Database (Denmark)

    De Chiffre, Leonardo; Hansen, Hans Nørgaard; Hattel, Jesper Henri

    2016-01-01

    Conventional length metrology for traceable accurate measurements requires costly temperature controlled facilities, long waiting time for part acclimatisation, and separate part material characterisation. This work describes a method called Dynamic Length Metrology (DLM) developed to achieve sub...

  2. Relativistic Quantum Metrology: Exploiting relativity to improve quantum measurement technologies

    CERN Document Server

    Ahmadi, Mehdi; Friis, Nicolai; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

    2013-01-01

    We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory (QFT). QFT properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in QFT including proper times and acce...

  3. Metrology Camera System of Prime Focus Spectrograph for Subaru Telescope

    CERN Document Server

    Wang, Shiang-Yu; Chang, Yin-Chang; Huang, Pin-Jie; Hu, Yen-Sang; Chen, Hsin-Yo; Tamura, Naoyuki; Takato, Naruhisa; Ling, Hung-Hsu; Gunn, James E; Karr, Jennifer; Yan, Chi-Hung; Mao, Peter; Ohyama, Youichi; Karoji, Hiroshi; Sugai, Hajime; Shimono, Atsushi

    2014-01-01

    The Prime Focus Spectrograph (PFS) is a new optical/near-infrared multi-fiber spectrograph designed for the prime focus of the 8.2m Subaru telescope. The metrology camera system of PFS serves as the optical encoder of the COBRA fiber motors for the configuring of fibers. The 380mm diameter aperture metrology camera will locate at the Cassegrain focus of Subaru telescope to cover the whole focal plane with one 50M pixel Canon CMOS sensor. The metrology camera is designed to provide the fiber position information within 5{\\mu}m error over the 45cm focal plane. The positions of all fibers can be obtained within 1s after the exposure is finished. This enables the overall fiber configuration to be less than 2 minutes.

  4. The metrology system of the VLTI instrument GRAVITY

    CERN Document Server

    Lippa, Magdalena; Blind, Nicolas; Kok, Yipting; Yazici, Senol; Weber, Johannes; Pfuhl, Oliver; Haug, Marcus; Kellner, Stefan; Wieprecht, Ekkehard; Eisenhauer, Frank; Genzel, Reinhard; Hans, Oliver; Haussmann, Frank; Huber, David; Kratschmann, Tobias; Ott, Thomas; Plattner, Markus; Rau, Christian; Sturm, Eckhard; Waisberg, Idel; Wiezorrek, Erich; Perrin, Guy; Perraut, Karine; Brandner, Wolfgang; Straubmeier, Christian; Amorim, Antonio

    2016-01-01

    The VLTI instrument GRAVITY combines the beams from four telescopes and provides phase-referenced imaging as well as precision-astrometry of order 10 microarcseconds by observing two celestial objects in dual-field mode. Their angular separation can be determined from their differential OPD (dOPD) when the internal dOPDs in the interferometer are known. Here, we present the general overview of the novel metrology system which performs these measurements. The metrology consists of a three-beam laser system and a homodyne detection scheme for three-beam interference using phase-shifting interferometry in combination with lock-in amplifiers. Via this approach the metrology system measures dOPDs on a nanometer-level.

  5. Web-Based Learning and Training for Virtual Metrology Lab

    CERN Document Server

    Al-Zahrani, Fahad

    2010-01-01

    The use of World Web Wide for distance education has received increasing attention over the past decades. The real challenge of adapting this technology for engineering education and training is to facilitate the laboratory experiments via Internet. In the sciences, measurement plays an important role. The accuracy of the measurement, as well as the units, help scientists to better understand phenomena occurring in nature. This paper introduces Metrology educators to the use and adoption of Java-applets in order to create virtual, online Metrology laboratories for students. These techniques have been used to successfully form a laboratory course which augments the more conventional lectures in concepts of Metrology course at Faculty of Engineering, Albaha University, KSA. Improvements of the package are still undergoing to incorporate Web-based technologies (Internet home page, HTML, Java programming etc...). This Web-based education and training has been successfully class-tested within an undergraduate prel...

  6. SOFTWARE OPEN SOURCE, SOFTWARE GRATIS?

    Directory of Open Access Journals (Sweden)

    Nur Aini Rakhmawati

    2006-01-01

    Full Text Available Normal 0 false false false IN X-NONE X-NONE MicrosoftInternetExplorer4 Berlakunya Undang – undang Hak Atas Kekayaan Intelektual (HAKI, memunculkan suatu alternatif baru untuk menggunakan software open source. Penggunaan software open source menyebar seiring dengan isu global pada Information Communication Technology (ICT saat ini. Beberapa organisasi dan perusahaan mulai menjadikan software open source sebagai pertimbangan. Banyak konsep mengenai software open source ini. Mulai dari software yang gratis sampai software tidak berlisensi. Tidak sepenuhnya isu software open source benar, untuk itu perlu dikenalkan konsep software open source mulai dari sejarah, lisensi dan bagaimana cara memilih lisensi, serta pertimbangan dalam memilih software open source yang ada. Kata kunci :Lisensi, Open Source, HAKI

  7. Software Reviews.

    Science.gov (United States)

    Smith, Richard L., Ed.

    1985-01-01

    Reviews software packages by providing extensive descriptions and discussions of their strengths and weaknesses. Software reviewed include (1) "VISIFROG: Vertebrate Anatomy" (grade seven-adult); (2) "Fraction Bars Computer Program" (grades three to six) and (3) four telecommunications utilities. (JN)

  8. Metrology Measurements of the DSTO Transonic Wind Tunnel Store Support Arm

    Science.gov (United States)

    2013-12-01

    UNCLASSIFIED UNCLASSIFIED Metrology Measurements of the DSTO Transonic Wind Tunnel Store Support Arm Adam Blandford, John Clayton...provide quality assurance for test clients. This document details metrology measurements that were conducted during February and March 2013 on the store...Australia 2013 AR-015-818 December 2013 APPROVED FOR PUBLIC RELEASE UNCLASSIFIED UNCLASSIFIED Metrology Measurements of the DSTO

  9. Topological metrology and its application to optical position sensing

    CERN Document Server

    Tischler, Nora; Singh, Sukhwinder; Zambrana-Puyalto, Xavier; Vidal, Xavier; Brennen, Gavin; Molina-Terriza, Gabriel

    2015-01-01

    We motivate metrology schemes based on topological singularities as a way to build robustness against deformations of the system. In particular, we relate reference settings of metrological systems to topological singularities in the measurement outputs. As examples we discuss optical nano-position sensing (i) using a balanced photodetector and a quadrant photodetector, and (ii) a more general image based scheme. In both cases the reference setting is a scatterer position that corresponds to a topological singularity in an output space constructed from the scattered field intensity distributions.

  10. Langley Research Center Metrology Program status for fiscal year 1987

    Science.gov (United States)

    Kern, Frederick A.

    1988-01-01

    The status of the Langley Research Center's metrology program for fiscal year 1987 is presented. The NASA Metrology Information System, which was operational for the entire year, provided the majority of performance data describing work analysis, turnaround time, out-of-tolerance instrument data, and other instrument service data. Calibration system development, equipment replacing and updating, status of last year's planned objectives, and Reference Standard certification requirements are described. The status of the LaRC voltage and resistance measurement assurance program and the agency-wide resistance program are reviewed. Progress on fiscal year 1987 objectives is discussed and fiscal year 1988 objectives are stated.

  11. Differential evolution for many-particle adaptive quantum metrology.

    Science.gov (United States)

    Lovett, Neil B; Crosnier, Cécile; Perarnau-Llobet, Martí; Sanders, Barry C

    2013-05-31

    We devise powerful algorithms based on differential evolution for adaptive many-particle quantum metrology. Our new approach delivers adaptive quantum metrology policies for feedback control that are orders-of-magnitude more efficient and surpass the few-dozen-particle limitation arising in methods based on particle-swarm optimization. We apply our method to the binary-decision-tree model for quantum-enhanced phase estimation as well as to a new problem: a decision tree for adaptive estimation of the unknown bias of a quantum coin in a quantum walk and show how this latter case can be realized experimentally.

  12. Low contact resistance in epitaxial graphene devices for quantum metrology

    Directory of Open Access Journals (Sweden)

    Tom Yager

    2015-08-01

    Full Text Available We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001 for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (<10 Ω suitable for high precision quantum resistance metrology.

  13. Low contact resistance in epitaxial graphene devices for quantum metrology

    Energy Technology Data Exchange (ETDEWEB)

    Yager, Tom, E-mail: yager@chalmers.se, E-mail: ywpark@snu.ac.kr; Lartsev, Arseniy; Lara-Avila, Samuel; Kubatkin, Sergey [Department of Microtechnology and Nanoscience, Chalmers University of Technology Göteborg, S-412 96 (Sweden); Cedergren, Karin [School of Physics, University of New South Wales, Sydney, NSW-2052 (Australia); Yakimova, Rositsa [Department of Physics, Chemistry and Biology (IFM), Linköping University Linköping, S-581 83 (Sweden); Panchal, Vishal; Kazakova, Olga [National Physical Laboratory, Teddington, TW11 0LW (United Kingdom); Tzalenchuk, Alexander [National Physical Laboratory, Teddington, TW11 0LW (United Kingdom); Department of Physics, Royal Holloway, University of London, Egham, TW20 0EX (United Kingdom); Kim, Kyung Ho; Park, Yung Woo, E-mail: yager@chalmers.se, E-mail: ywpark@snu.ac.kr [Department of Physics and Astronomy, Seoul National University, Seoul 151-747 (Korea, Republic of)

    2015-08-15

    We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (<10 Ω) suitable for high precision quantum resistance metrology.

  14. Handbook of 3D machine vision optical metrology and imaging

    CERN Document Server

    Zhang, Song

    2013-01-01

    With the ongoing release of 3D movies and the emergence of 3D TVs, 3D imaging technologies have penetrated our daily lives. Yet choosing from the numerous 3D vision methods available can be frustrating for scientists and engineers, especially without a comprehensive resource to consult. Filling this gap, Handbook of 3D Machine Vision: Optical Metrology and Imaging gives an extensive, in-depth look at the most popular 3D imaging techniques. It focuses on noninvasive, noncontact optical methods (optical metrology and imaging). The handbook begins with the well-studied method of stereo vision and

  15. Metrology for Radiological Early Warning Networks in Europe ("METROERM")-A Joint European Metrology Research Project.

    Science.gov (United States)

    Neumaier, Stefan; Dombrowski, Harald; Kessler, Patrick

    2016-08-01

    As a consequence of the Chernobyl nuclear power plant accident in 1986, all European countries have installed automatic dosimetry network stations as well as air sampling systems for the monitoring of airborne radioactivity. In Europe, at present, almost 5,000 stations measure dose rate values in nearly real time. In addition, a few hundred air samplers are operated. Most of them need extended accumulation times with no real-time capability. National dose rate data are provided to the European Commission (EC) via the EUropean Radiological Data Exchange Platform (EURDEP). In case of a nuclear emergency with transboundary implications, the EC may issue momentous recommendations to EU member states based on the radiological data collected by EURDEP. These recommendations may affect millions of people and could have severe economic and sociological consequences. Therefore, the reliability of the EURDEP data is of key importance. Unfortunately, the dose rate and activity concentration data are not harmonized between the different networks. Therefore, within the framework of the European Metrology Research Programme (EMRP), 16 European institutions formed the consortium MetroERM with the aim to improve the metrological foundation of measurements and to introduce a pan-European harmonization for the collation and evaluation of radiological data in early warning network systems. In addition, a new generation of detector systems based on spectrometers capable of providing both reliable dose rate values as well as nuclide specific information in real time are in development. The MetroERM project and its first results will be presented and discussed in this article.

  16. Benefit quantification of interoperability in coordinate metrology

    DEFF Research Database (Denmark)

    Savio, E.; Carmignato, S.; De Chiffre, Leonardo

    2014-01-01

    these inefficiencies. The paper presents a methodology for an economic evaluation of interoperability benefits with respect to the verification of geometrical product specifications. It requires input data from testing and inspection activities, as well as information on training of personnel and licensing of software...

  17. Dark matter: a problem in relativistic metrology?

    Science.gov (United States)

    Lusanna, Luca

    2017-05-01

    Besides the tidal degrees of freedom of Einstein general relativity (GR) (namely the two polarizations of gravitational waves after linearization of the theory) there are the inertial gauge ones connected with the freedom in the choice of the 4-coordinates of the space-time, i.e. in the choice of the notions of time and 3-space (the 3+1 splitting of space-time) and in their use to define a non-inertial frame (the inertial ones being forbidden by the equivalence principle) by means of a set of conventions for the relativistic metrology of the space-time (like the GPS ones near the Earth). The canonical York basis of canonical ADM gravity allows us to identify the Hamiltonian inertial gauge variables in globally hyperbolic asymptotically Minkowskian space-times without super-translations and to define the family of non-harmonic Schwinger time gauges. In these 3+1 splittings of space-time the freedom in the choice of time (the problem of clock synchronization) is described by the inertial gauge variable York time (the trace of the extrinsic curvature of the instantaneous 3-spaces). This inertial gauge freedom and the non-Euclidean nature of the instantaneous 3-spaces required by the equivalence principle need to be incorporated as metrical conventions in a relativistic suitable extension of the existing (essentially Galilean) ICRS celestial reference system. In this paper I make a short review of the existing possibilities to explain the presence of dark matter (or at least of part of it) as a relativistic inertial effect induced by the non- Euclidean nature of the 3-spaces. After a Hamiltonian Post-Minkowskian (HPM) linearization of canonical ADM tetrad gravity with particles, having equal inertial and gravitational masses, as matter, followed by a Post-Newtonian (PN) expansion, we find that the Newtonian equality of inertial and gravitational masses breaks down and that the inertial gauge York time produces an increment of the inertial masses explaining at least

  18. Digital Image Correlation: Metrological Characterization in Mechanical Analysis

    Science.gov (United States)

    Petrella, Orsola; Signore, Davide; Caramuta, Pietro; Toscano, Cinzia; Ferraiuolo, Michele

    2017-04-01

    The Digital Image Correlation (DIC) is a newly developed optical technique that is spreading in all engineering sectors because it allows the non-destructive estimation of the entire surface deformation without any contact with the component under analysis. These characteristics make the DIC very appealing in all the cases the global deformation state is to be known without using strain gages, which are the most used measuring device. The DIC is applicable to any material subjected to distortion caused by either thermal or mechanical load, allowing to obtain high-definition mapping of displacements and deformations. That is why in the civil and the transportation industry, DIC is very useful for studying the behavior of metallic materials as well as of composite materials. DIC is also used in the medical field for the characterization of the local strain field of the vascular tissues surface subjected to uniaxial tensile loading. DIC can be carried out in the two dimension mode (2D DIC) if a single camera is used or in a three dimension mode (3D DIC) if two cameras are involved. Each point of the test surface framed by the cameras can be associated with a specific pixel of the image and the coordinates of each point are calculated knowing the relative distance between the two cameras together with their orientation. In both arrangements, when a component is subjected to a load, several images related to different deformation states can be are acquired through the cameras. A specific software analyzes the images via the mutual correlation between the reference image (obtained without any applied load) and those acquired during the deformation giving the relative displacements. In this paper, a Metrological Characterization of the Digital Image Correlation is performed on aluminum and composite targets both in static and dynamic loading conditions by comparison between DIC and strain gauges measures. In the static test, interesting results have been obtained thanks

  19. FOREWORD: Conference on Advanced Metrology for Cancer Therapy 2011 Conference on Advanced Metrology for Cancer Therapy 2011

    Science.gov (United States)

    Ankerhold, Ulrike

    2012-10-01

    Although physical treatments play a central role in cancer therapy, SI-traceable metrology has only been established for some of them. Several forms of treatment currently used (particularly intensity-modulated radiation therapy (IMRT), hadron therapy, high-intensity therapeutic ultrasound (HITU) and brachytherapy) suffer from the limited metrological support, which restricts the success of these techniques. Recognizing this deficit, the European Union identified metrology for health as one of the first four Targeted Programmes in the framework of the European Metrology Research Programme (EMRP) running from 2008 to 2011. This programme included two EMRP projects addressing metrology for cancer therapy: project T2.J06 dealing with brachytherapy project T2.J07 dealing with external beam cancer therapy using ionizing radiation and high-intensity therapeutic ultrasound. Primary measurement standards applicable to modern treatment conditions were developed under both projects, together with measurement techniques which are meant as a basis for future protocols for dosimetry, treatment planning and monitoring. In order to provide a platform for the presentation of current developments in clinical measurement techniques for cancer therapy, together with the achievements of both projects, an international Conference on Advanced Metrology for Cancer Therapy (CAMCT) was held from 29 November to 1 December 2011 at the Physikalisch-Technische Bundesanstalt (PTB) in Braunschweig, Germany. The main sessions of the conference: Primary and secondary standards of absorbed dose to water for IMRT and brachytherapy, 3D dose distributions and treatment planning for IMRT and brachytherapy, Hadron therapy (protons and carbon ions), High-intensity therapeutic ultrasound (HITU), were geared to the main foci of the projects. Metrologists and medical physicists from countries all over the world attended the conference and made it into a forum for the exchange of information and expertise

  20. Software reliability

    CERN Document Server

    Bendell, A

    1986-01-01

    Software Reliability reviews some fundamental issues of software reliability as well as the techniques, models, and metrics used to predict the reliability of software. Topics covered include fault avoidance, fault removal, and fault tolerance, along with statistical methods for the objective assessment of predictive accuracy. Development cost models and life-cycle cost models are also discussed. This book is divided into eight sections and begins with a chapter on adaptive modeling used to predict software reliability, followed by a discussion on failure rate in software reliability growth mo

  1. Computer software.

    Science.gov (United States)

    Rosenthal, L E

    1986-10-01

    Software is the component in a computer system that permits the hardware to perform the various functions that a computer system is capable of doing. The history of software and its development can be traced to the early nineteenth century. All computer systems are designed to utilize the "stored program concept" as first developed by Charles Babbage in the 1850s. The concept was lost until the mid-1940s, when modern computers made their appearance. Today, because of the complex and myriad tasks that a computer system can perform, there has been a differentiation of types of software. There is software designed to perform specific business applications. There is software that controls the overall operation of a computer system. And there is software that is designed to carry out specialized tasks. Regardless of types, software is the most critical component of any computer system. Without it, all one has is a collection of circuits, transistors, and silicone chips.

  2. Sub-shot-noise quantum metrology with entangled identical particles

    CERN Document Server

    Benatti, F; Marzolino, U

    2010-01-01

    The usual notion of separability has to be reconsidered when applied to states describing identical particles. A definition of separability not related to any a priori Hilbert space tensor product structure is needed: this can be given in terms of commuting subalgebras of observables. Accordingly, the results concerning the use of the quantum Fisher information in quantum metrology are generalized and physically reinterpreted.

  3. Precision nanometrology of a large area microstructured metrology surface

    Institute of Scientific and Technical Information of China (English)

    WEI Gao; TAKESHI Araki; SATOSHI Kiyono

    2003-01-01

    @@ 1 Introduction The authors have been working on a newsurface encoder for detecting multi-degree-of-freedom(MDOF) translational and tilt motionsof precision stages[1]. The surface encoder con-sists of two fundamental elements: a sinusoidalmicrostructured metrology surface, which is re-ferred to as the angle grid, and a two-dimension-al (2D) slope sensor[2-3].

  4. At-wavelength Optical Metrology Development at the ALS

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Sheng Sam; Goldberg, Kenneth A.; Yashchuk, Valeriy V.; Celestre, Richard; Mochi, Iacopo; Macdougall, James; Morrison, Gregory Y.; Smith, Brian V.; Domning, Edward E.; McKinney, Wayne R.; Warwick, Tony

    2010-07-19

    Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

  5. Metrology of sub-micron structured polymer surfaces

    DEFF Research Database (Denmark)

    Quagliotti, Danilo; Tosello, Guido; Salaga, J.

    surface replication of the tool insert component when moulding the polymer melt [1]. This aspect is particularly critical when dealing with increasingly small dimensional scales in micro- and nano-structured surfaces [2, 3].In this context, a metrological investigation of polymer replicated surfaces using...

  6. Metrology Optical Power Budgeting in SIM Using Statistical Analysis Techniques

    Science.gov (United States)

    Kuan, Gary M

    2008-01-01

    The Space Interferometry Mission (SIM) is a space-based stellar interferometry instrument, consisting of up to three interferometers, which will be capable of micro-arc second resolution. Alignment knowledge of the three interferometer baselines requires a three-dimensional, 14-leg truss with each leg being monitored by an external metrology gauge. In addition, each of the three interferometers requires an internal metrology gauge to monitor the optical path length differences between the two sides. Both external and internal metrology gauges are interferometry based, operating at a wavelength of 1319 nanometers. Each gauge has fiber inputs delivering measurement and local oscillator (LO) power, split into probe-LO and reference-LO beam pairs. These beams experience power loss due to a variety of mechanisms including, but not restricted to, design efficiency, material attenuation, element misalignment, diffraction, and coupling efficiency. Since the attenuation due to these sources may degrade over time, an accounting of the range of expected attenuation is needed so an optical power margin can be book kept. A method of statistical optical power analysis and budgeting, based on a technique developed for deep space RF telecommunications, is described in this paper and provides a numerical confidence level for having sufficient optical power relative to mission metrology performance requirements.

  7. Nuclear Technology. Course 27: Metrology. Module 27-6, Calibration.

    Science.gov (United States)

    Espy, John; Selleck, Ben

    This sixth in a series of eight modules for a course titled Metrology describes the principles on which calibration programs are developed, no matter which instruments are included in the calibration program. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4)…

  8. Incoming Metrology of Segmented X-Ray Mandrels at MSFC

    Science.gov (United States)

    Gubarev, Mikhail; ODell, Steve; Kester, Thomas; Lehner, David; Jones, William; Smithers, Martin

    2004-01-01

    The Constellation-X Spectroscopy X-ray telescope (SXT) is designed to be built from X-ray optic segments. The X-ray segments will be fabricated from the segmented mandrels using a replication process. The purpose of the incoming metrology is to map the surface of the mandrels, so the performance of the X-ray optics produced can be predicted. Three Constellation-X segmented mandrels have been delivered to MSFC for incoming metrology. The segmented mandrels are 30-degree sections of a cylindrical surface and have diameters of 1.0 m, 1.2 m and 1.6 m. The maximum dimensions of the optical surface are 1.0 m axial length and 0.5 m azimuthal segment length. The metrology of the mandrels consists of the measurement of their slope differences, roundness, absolute radius, axial profile and microroughness. Accuracy goals for each type of measurement and the accuracy of the instruments used for the measurements will be discussed. The results of the mandrel metrology together with the performance predictions will be presented.

  9. Nuclear Technology. Course 27: Metrology. Module 27-5, Tolerancing.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This fifth in a series of eight modules for a course titled Metrology describes the application of the American National Standard (ANSI Y14.5-1973) for dimensioning and tolerancing and gives guidance on interpreting form and location controls consistent with the national standard. The module follows a typical format that includes the following…

  10. Optical metrology tools for the Virgo projet

    Science.gov (United States)

    Loriette, V.

    For more than thirty years the search for gravitationnal waves, predicted by Einstein's relativistic theory of gravitation, has been an intense research field in experimental as well as theoretical physics. Today, with the constant advance of technology in optics, lasers, data analysis and processing, ... a promising way of directly detecting gravitationnal waves with earth-based instruments is optical interferometry. Before the end of this century many experiments will be carried on in Australia, Europe, Japan and the United States to detect the passage of a gravitationnal wave through giant Michelson-type interferometers. The effects predicted are so small, (a gravitationnal wave changes the length of three kilometer long arms by one thousandth of a fermi) that the need for “perfect” optical components is a key to the success of these experiments. Still a few years ago it would have been impossible to make optical components that would satisfy the required specifications for such interferometric detectors. For nearly ten years constant R&D efforts in optical coating manufacturing, optical material fabrication and optical metrology, allow us today to make such components. This text is intended to describe the field of optical metrology as it is needed for the testing of optical parts having performances far beyond than everything previously made. The first chapter is an introduction to gravitationnal waves, their sources and their effects on detectors. Starting by newtonian mechanics we jump rapidly to the general theory of relativity and describe particular solutions of Einstein's equations in the case of weak gravitationnal fields, which are periodic perturbations of the space-time metric in the form of plane waves, the so-called gravitationnal waves. We present various candidate sources, terrestrial and extra-terrestrial and give a short description of the two families of detectors: resonnant bars and optical interferometers. The second part of this chapter

  11. Validation of virtual instrument for data analysis in metrology of time and frequency; Validacao do instrumento virtual para analise de dados em metrologia de tempo e frequencia

    Energy Technology Data Exchange (ETDEWEB)

    Jordao, Bruno; Quaresma, Daniel; Rocha, Pedro; Carvalho, Ricardo, E-mail: bjordan@on.br [Observatorio Nacional (ON), Rio de Janeiro, RJ (Brazil). Laboratorio Primario de Tempo e Frequencia; Peixoto, Jose Guilherme [Instituto de Radioprotecao e Dosimetria (LNMRI/IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil). Laboratorio Nacional de Metrologia das Radiacoes Ionizantes

    2016-07-01

    Commercial Software (CS) for collection, analysis and plot time and frequency data plots are being increasingly used in reference laboratories worldwide. With this, it has greatly improved the results of calculations of uncertainty for these values. We propose the creation of a collection of software and data analysis using Virtual Instruments (VI) developed the Primary Laboratory Time and frequency of the National Observatory - ON and validation of this instrument. To validate the instrument developed, it made a comparative analysis between the results obtained (VI) with the results obtained by (CS) widely used in many metrology laboratories. From these results we can conclude that there was equivalence between the analyzed data. (author)

  12. AAO Starbugs: software control and associated algorithms

    CERN Document Server

    Lorente, Nuria P F; Shortridge, Keith; Farrell, Tony J; Smedley, Scott; Hong, Sungwook E; Bacigalupo, Carlos; Goodwin, Michael; Kuehn, Kyler; Satorre, Christophe

    2016-01-01

    The Australian Astronomical Observatory's TAIPAN instrument deploys 150 Starbug robots to position optical fibres to accuracies of 0.3 arcsec, on a 32 cm glass field plate on the focal plane of the 1.2 m UK-Schmidt telescope. This paper describes the software system developed to control and monitor the Starbugs, with particular emphasis on the automated path-finding algorithms, and the metrology software which keeps track of the position and motion of individual Starbugs as they independently move in a crowded field. The software employs a tiered approach to find a collision-free path for every Starbug, from its current position to its target location. This consists of three path-finding stages of increasing complexity and computational cost. For each Starbug a path is attempted using a simple method. If unsuccessful, subsequently more complex (and expensive) methods are tried until a valid path is found or the target is flagged as unreachable.

  13. AAO Starbugs: software control and associated algorithms

    Science.gov (United States)

    Lorente, Nuria P. F.; Vuong, Minh V.; Shortridge, Keith; Farrell, Tony J.; Smedley, Scott; Hong, Sungwook E.; Bacigalupo, Carlos; Goodwin, Michael; Kuehn, Kyler; Satorre, Christophe

    2016-08-01

    The Australian Astronomical Observatory's TAIPAN instrument deploys 150 Starbug robots to position optical fibres to accuracies of 0.3 arcsec, on a 32 cm glass field plate on the focal plane of the 1.2 m UK-Schmidt telescope. This paper describes the software system developed to control and monitor the Starbugs, with particular emphasis on the automated path-finding algorithms, and the metrology software which keeps track of the position and motion of individual Starbugs as they independently move in a crowded field. The software employs a tiered approach to find a collision-free path for every Starbug, from its current position to its target location. This consists of three path-finding stages of increasing complexity and computational cost. For each Starbug a path is attempted using a simple method. If unsuccessful, subsequently more complex (and expensive) methods are tried until a valid path is found or the target is flagged as unreachable.

  14. Software piracy

    OpenAIRE

    Kráčmer, Stanislav

    2011-01-01

    The objective of the present thesis is to clarify the term of software piracy and to determine responsibility of individual entities as to actual realization of software piracy. First, the thesis focuses on a computer programme, causes, realization and pitfalls of its inclusion under copyright protection. Subsequently, it observes methods of legal usage of a computer programme. This is the point of departure for the following attempt to define software piracy, accompanied with methods of actu...

  15. Software engineering

    CERN Document Server

    Sommerville, Ian

    2016-01-01

    For courses in computer science and software engineering The Fundamental Practice of Software Engineering Software Engineering introduces readers to the overwhelmingly important subject of software programming and development. In the past few years, computer systems have come to dominate not just our technological growth, but the foundations of our world's major industries. This text seeks to lay out the fundamental concepts of this huge and continually growing subject area in a clear and comprehensive manner. The Tenth Edition contains new information that highlights various technological updates of recent years, providing readers with highly relevant and current information. Sommerville's experience in system dependability and systems engineering guides the text through a traditional plan-based approach that incorporates some novel agile methods. The text strives to teach the innovators of tomorrow how to create software that will make our world a better, safer, and more advanced place to live.

  16. Automated hotspot analysis with aerial image CD metrology for advanced logic devices

    Science.gov (United States)

    Buttgereit, Ute; Trautzsch, Thomas; Kim, Min-ho; Seo, Jung-Uk; Yoon, Young-Keun; Han, Hak-Seung; Chung, Dong Hoon; Jeon, Chan-Uk; Meyers, Gary

    2014-09-01

    Continuously shrinking designs by further extension of 193nm technology lead to a much higher probability of hotspots especially for the manufacturing of advanced logic devices. The CD of these potential hotspots needs to be precisely controlled and measured on the mask. On top of that, the feature complexity increases due to high OPC load in the logic mask design which is an additional challenge for CD metrology. Therefore the hotspot measurements have been performed on WLCD from ZEISS, which provides the benefit of reduced complexity by measuring the CD in the aerial image and qualifying the printing relevant CD. This is especially of advantage for complex 2D feature measurements. Additionally, the data preparation for CD measurement becomes more critical due to the larger amount of CD measurements and the increasing feature diversity. For the data preparation this means to identify these hotspots and mark them automatically with the correct marker required to make the feature specific CD measurement successful. Currently available methods can address generic pattern but cannot deal with the pattern diversity of the hotspots. The paper will explore a method how to overcome those limitations and to enhance the time-to-result in the marking process dramatically. For the marking process the Synopsys WLCD Output Module was utilized, which is an interface between the CATS mask data prep software and the WLCD metrology tool. It translates the CATS marking directly into an executable WLCD measurement job including CD analysis. The paper will describe the utilized method and flow for the hotspot measurement. Additionally, the achieved results on hotspot measurements utilizing this method will be presented.

  17. Investigation into the use of smartphone as a machine vision device for engineering metrology and flaw detection, with focus on drilling

    Science.gov (United States)

    Razdan, Vikram; Bateman, Richard

    2015-05-01

    This study investigates the use of a Smartphone and its camera vision capabilities in Engineering metrology and flaw detection, with a view to develop a low cost alternative to Machine vision systems which are out of range for small scale manufacturers. A Smartphone has to provide a similar level of accuracy as Machine Vision devices like Smart cameras. The objective set out was to develop an App on an Android Smartphone, incorporating advanced Computer vision algorithms written in java code. The App could then be used for recording measurements of Twist Drill bits and hole geometry, and analysing the results for accuracy. A detailed literature review was carried out for in-depth study of Machine vision systems and their capabilities, including a comparison between the HTC One X Android Smartphone and the Teledyne Dalsa BOA Smart camera. A review of the existing metrology Apps in the market was also undertaken. In addition, the drilling operation was evaluated to establish key measurement parameters of a twist Drill bit, especially flank wear and diameter. The methodology covers software development of the Android App, including the use of image processing algorithms like Gaussian Blur, Sobel and Canny available from OpenCV software library, as well as designing and developing the experimental set-up for carrying out the measurements. The results obtained from the experimental set-up were analysed for geometry of Twist Drill bits and holes, including diametrical measurements and flaw detection. The results show that Smartphones like the HTC One X have the processing power and the camera capability to carry out metrological tasks, although dimensional accuracy achievable from the Smartphone App is below the level provided by Machine vision devices like Smart cameras. A Smartphone with mechanical attachments, capable of image processing and having a reasonable level of accuracy in dimensional measurement, has the potential to become a handy low-cost Machine vision

  18. Software requirements

    CERN Document Server

    Wiegers, Karl E

    2003-01-01

    Without formal, verifiable software requirements-and an effective system for managing them-the programs that developers think they've agreed to build often will not be the same products their customers are expecting. In SOFTWARE REQUIREMENTS, Second Edition, requirements engineering authority Karl Wiegers amplifies the best practices presented in his original award-winning text?now a mainstay for anyone participating in the software development process. In this book, you'll discover effective techniques for managing the requirements engineering process all the way through the development cy

  19. Half a century of light scatter metrology and counting

    Science.gov (United States)

    Stover, John C.

    2014-09-01

    Back in the early days Bill Wolf once said something like: "The guy with the lowest scatter measurement is closest to the right answer." He was often right then - but not anymore. Everything has changed. Today measurements are limited by Rayleigh scatter from the air - not the instrument. We have both written and physical standards and everybody spells BRDF the same way. In the time it takes to give this talk, over 100,000 silicon wafers will be inspected around the world using a few thousand scatterometers - average price about one million dollars each. The way the world illuminates everything from homes to football fields is changing with the advent of high brightness LED's and these lighting systems are designed using a combination of scatter metrology and analysis techniques - many of which were started at The Optical Sciences Center. This paper reviews two major highlights in half a century of scatter metrology progress.

  20. Fiscal Year 2005 Solar Radiometry and Metrology Task Accomplishments

    Energy Technology Data Exchange (ETDEWEB)

    Myers, D.; Andreas, A.; Reda, I.; Gotseff, P.; Wilcox, S.; Stoffel, T.; Anderberg, M.; Kay, B.; Bowen, A.

    2005-11-01

    The National Renewable Energy Laboratory (NREL) Solar Radiometry and Metrology task provides traceable optical radiometric calibrations and measurements to photovoltaic (PV) researchers and the PV industry. Traceability of NREL solar radiometer calibrations to the World Radiometric Reference (WRR) was accomplished during Pyrheliometer Comparison at NREL in October 2004. Ten spectral and more than 200 broadband radiometers for solar measurements were calibrated this year. We measured detailed spectral distributions of the NREL and PV industry Pulsed Solar Simulators and are analyzing the influence of environmental variables on radiometer uncertainty. New systems for indoor and outdoor solar radiometer calibrations and ultraviolet (UV) spectral measurements and UV radiometer calibrations were purchased and tested. Optical metrology functions support the NREL Measurement and Characterization Task effort for ISO 17025 accreditation of NREL Solar Reference Cell Calibrations and have been integrated into the NREL quality system and audited for ISO17025 compliance.

  1. Ultracold Molecules in Lattices for Metrology and Precision Measurements

    Science.gov (United States)

    Reinaudi, Gael; Osborn, Chris; McDonald, Mickey; Wang, Dili; Zelevinsky, Tanya

    2012-06-01

    Ultracold diatomic molecules offer exciting possibilities for studies of novel states of matter, quantum information, and metrology. Two-electron-atom based molecules are particularly promising for precision measurements, such as molecular time metrology and variations of the proton-electron mass ratio. We present an experimental setup that allows for the photoassociation, in an optical lattice, of strontium atoms into molecules using the narrow singlet-triplet transitions. We feature newly observed two-photon photoassociation to deeply bound molecular levels, as well as the study of the lifetime of such molecules in lattices, which is a determining factor concerning the practical use of this system. Other characteristics of our setup are presented, such as a computer controlled permanent-magnet Zeeman slower optimized with a genetic algorithm.

  2. Development of ITER in-vessel viewing and metrology systems

    Energy Technology Data Exchange (ETDEWEB)

    Obara, Kenjiro; Kakudate, Satoshi; Nakahira, Masataka; Ito, Akira [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

    1998-04-01

    The ITER in-vessel viewing system is vital for detecting and locating damage to in-vessel components such as the blankets and divertors and in monitoring and assisting in-vessel maintenance. This system must be able to operate at high temperature (200degC) under intense gamma radiation ({approx}30 kGy/h) in a high vacuum or 1 bar inert gas. A periscope viewing system was chosen as a reference due to its clear, wide view and a fiberscope viewing system chosen as a backup for viewing in narrow confines. According to the ITER R and D program, both systems and a metrology system are being developed through the joint efforts of Japan, the U.S., and RF Home Teams. This paper outlines design and technology development mainly on periscope in-vessel viewing and laser metrology contributed by the Japan Home Team. (author)

  3. Metrology for industrial quantum communications: the MIQC project

    Science.gov (United States)

    Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

    2014-12-01

    The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

  4. Development of a virtual metrology method using plasma harmonics analysis

    Science.gov (United States)

    Jun, H.; Shin, J.; Kim, S.; Choi, H.

    2017-07-01

    A virtual metrology technique based on plasma harmonics is developed for predicting semiconductor processes. From a plasma process performed by 300 mm photoresist stripper equipment, a strong correlation is found between optical plasma harmonics intensities and the process results, such as the photoresist strip rate and strip non-uniformity. Based on this finding, a general process prediction model is developed. The developed virtual metrology model shows that the R-squared (R2) values between the measured and predicted process results are 95% and 64% for the photoresist strip rate and photoresist strip non-uniformity, respectively. This is the first research on process prediction based on optical plasma harmonics analysis, and the results can be applied to semiconductor processes such as dry etching and plasma enhanced chemical vapor deposition.

  5. The elusive Heisenberg limit in quantum-enhanced metrology

    Science.gov (United States)

    Demkowicz-Dobrzański, Rafał; Kołodyński, Jan; Guţă, Mădălin

    2012-01-01

    Quantum precision enhancement is of fundamental importance for the development of advanced metrological optical experiments, such as gravitational wave detection and frequency calibration with atomic clocks. Precision in these experiments is strongly limited by the 1/√N shot noise factor with N being the number of probes (photons, atoms) employed in the experiment. Quantum theory provides tools to overcome the bound by using entangled probes. In an idealized scenario this gives rise to the Heisenberg scaling of precision 1/N. Here we show that when decoherence is taken into account, the maximal possible quantum enhancement in the asymptotic limit of infinite N amounts generically to a constant factor rather than quadratic improvement. We provide efficient and intuitive tools for deriving the bounds based on the geometry of quantum channels and semi-definite programming. We apply these tools to derive bounds for models of decoherence relevant for metrological applications including: depolarization, dephasing, spontaneous emission and photon loss. PMID:22990859

  6. Metrology in an ISO 15189 accredited medical biology laboratory

    Directory of Open Access Journals (Sweden)

    Guichet C.

    2014-01-01

    Full Text Available All French medical biology laboratories must be accredited according to ISO 15189 for all tests conducted. Metrology is therefore critical and covers a wide variety of areas. This presentation will focus on the metrology manager’s role which is tailored to the medical biology laboratory: human resources in place, methods used, parameters followed, equipment used and strategies implemented when using equipment which is not connected to the International System of Units. It will be illustrated by examples of in vitro and in vivo clinical biochemistry, biological haematology, human toxicology and radiotoxicology. The presentation will cover the exploitation of results of internal controls and interlaboratory comparisons in order to calculate uncertainties and provide doctors with a result along with an interpretation or opinion to ensure optimum patient care. The conclusion will present the steps carried out at the Laboratoire National d’Essai (French National Testing Laboratory to provide medical biology laboratories with certified clinical biology standards.

  7. X-ray microscope assemblies. Final report and metrology report

    Energy Technology Data Exchange (ETDEWEB)

    Zehnpfennig, T.F.

    1981-04-13

    This is the Final Report and Metrology Report prepared under Lawrence Livermore Laboratory Subcontract 9936205, X-ray Microscope Assemblies. The purpose of this program was to design, fabricate, and perform detailed metrology on an axisymmetric grazing-incidence x-ray microscope (XRMS) to be used as a diagnostic instrument in the Lawrence Livermore Laser Fusion Program. The optical configuration chosen for this device consists of two internally polished surfaces of revolution: an hyperboloid facing the object; and a confocal, co-axial elliposid facing the image. This arrangement is known as the Wolter Type-I configuration. The grazing angle of reflection for both surfaces is approximately 1/sup 0/. The general optical performance goals under this program were to achieve a spatial resolution in the object plane in the soft x-ray region of approximately 1 micron, and to achieve an effective solid collecting angle which is an appreciable fraction of the geometric solid collecting angle.

  8. General optimality of the Heisenberg limit for quantum metrology.

    Science.gov (United States)

    Zwierz, Marcin; Pérez-Delgado, Carlos A; Kok, Pieter

    2010-10-29

    Quantum metrology promises improved sensitivity in parameter estimation over classical procedures. However, there is a debate over the question of how the sensitivity scales with the resources and the number of queries that are used in estimation procedures. Here, we reconcile the physical definition of the relevant resources used in parameter estimation with the information-theoretical scaling in terms of the query complexity of a quantum network. This leads to a completely general optimality proof of the Heisenberg limit for quantum metrology. We give an example of how our proof resolves paradoxes that suggest sensitivities beyond the Heisenberg limit, and we show that the Heisenberg limit is an information-theoretic interpretation of the Margolus-Levitin bound, rather than Heisenberg's uncertainty relation.

  9. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Sheng; Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Celestre, Rich; Church, Matthew; McKinney, Wayne R.; Morrison, Greg; Warwick, Tony

    2010-01-31

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situ visible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  10. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, S.; Yashchuk, V.V.; Goldberg, K.A.; Celestre, R.; Church, M.; McKinney, W.R.; Morrison, G.; Warwick, T.

    2009-09-18

    We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situvisible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

  11. Information systems as a tool to improve legal metrology activities

    Science.gov (United States)

    Rodrigues Filho, B. A.; Soratto, A. N. R.; Gonçalves, R. F.

    2016-07-01

    This study explores the importance of information systems applied to legal metrology as a tool to improve the control of measuring instruments used in trade. The information system implanted in Brazil has also helped to understand and appraise the control of the measurements due to the behavior of the errors and deviations of instruments used in trade, allowing the allocation of resources wisely, leading to a more effective planning and control on the legal metrology field. A study case analyzing the fuel sector is carried out in order to show the conformity of fuel dispersers according to maximum permissible errors. The statistics of measurement errors of 167,310 fuel dispensers of gasoline, ethanol and diesel used in the field were analyzed demonstrating the accordance of the fuel market in Brazil to the legal requirements.

  12. Atom chip based generation of entanglement for quantum metrology

    CERN Document Server

    Riedel, Max F; Li, Yun; Hänsch, Theodor W; Sinatra, Alice; Treutlein, Philipp

    2010-01-01

    Atom chips provide a versatile `quantum laboratory on a microchip' for experiments with ultracold atomic gases. They have been used in experiments on diverse topics such as low-dimensional quantum gases, cavity quantum electrodynamics, atom-surface interactions, and chip-based atomic clocks and interferometers. A severe limitation of atom chips, however, is that techniques to control atomic interactions and to generate entanglement have not been experimentally available so far. Such techniques enable chip-based studies of entangled many-body systems and are a key prerequisite for atom chip applications in quantum simulations, quantum information processing, and quantum metrology. Here we report experiments where we generate multi-particle entanglement on an atom chip by controlling elastic collisional interactions with a state-dependent potential. We employ this technique to generate spin-squeezed states of a two-component Bose-Einstein condensate and show that they are useful for quantum metrology. The obser...

  13. A blueprint for radioanalytical metrology CRMs, intercomparisons, and PE

    Energy Technology Data Exchange (ETDEWEB)

    Inn, Kenneth G.W. [National Institute of Standards and Technology, 100 Bureau Dr., MS 8462, Gaithersburg, MD 20899-8462 (United States)], E-mail: kenneth.inn@nist.gov; Kurosaki, Hiromu [National Institute of Standards and Technology, 100 Bureau Dr., MS 8462, Gaithersburg, MD 20899-8462 (United States); Frechou, Carole [Commissariat a l' Energie Atomique, CE Saclay-Bat 459, Gif sur Yvette Cedex 91191 (France); Gilligan, Chris [National Physical Laboratory, F6-A4 Hampton Road, Teddington TW11 0LW (United Kingdom); Jones, Robert [Center for Disease Control, 4770 Buford Highway, MS F-18, Atlanta, GA 30341 (United States); LaMont, Stephen [Los Alamos National Laboratory, P.O. Box 1663, MS J514, Los Alamos, NM 87545 (United States); Leggitt, Jeff [Federal Bureau of Investigation, 2501 Investigation Pkwy, Quantico, VA 22135 (United States); Li Chunsheng [Health Canada, 775 Brookfield Rd, Ottawa, K1A 1C1 (Canada); McCroan, Keith [US Environmental Protection Agency, 540 S Morris Avenue, Montgomery, AL 36115 (United States); Swatski, Ronald [Department of Army USACHPPM, 5158 Blackhawk Rd., APG-EA, MD 21010-5422 (United States)

    2008-06-15

    A workshop was held from 28 February to 2 March 2006 at the National Institute of Standards and Technology (NIST) to evaluate the needs for new directions for complex matrix reference materials certified for radionuclide content, interlaboratory comparisons and performance evaluation (PE) programs. The workshop identified new radioanalytical metrology thrust areas needed for environmental, radiobioassay, emergency consequence management, and nuclear forensics, attribution, nonproliferation, and safeguards.

  14. Ptychography for optical metrology with limited translation knowledge.

    Science.gov (United States)

    Moore, Dustin B; Fienup, James R

    2016-06-10

    We introduce unknown-transverse translation diversity phase retrieval: a ptychographic algorithm for optical metrology when a subaperture is translating through a plane conjugate to the exit pupil in a very poorly known fashion. The algorithm estimates the direction of translation and the distance traveled by the subaperture from one point spread function (PSF) to the next. It also estimates unknown point target motion and rotations of the subaperture between PSF acquisitions from the PSF data.

  15. Software Innovation

    DEFF Research Database (Denmark)

    Rose, Jeremy

      Innovation is the forgotten key to modern systems development - the element that defines the enterprising engineer, the thriving software firm and the cutting edge software application.  Traditional forms of technical education pay little attention to creativity - often encouraging overly...... rationalistic ways of thinking which stifle the ability to innovate. Professional software developers are often drowned in commercial drudgery and overwhelmed by work pressure and deadlines. The topic that will both ensure success in the market and revitalize their work lives is never addressed. This book sets...... out the new field of software innovation. It organizes the existing scientific research into eight simple heuristics - guiding principles for organizing a system developer's work-life so that it focuses on innovation....

  16. Software Reviews.

    Science.gov (United States)

    Classroom Computer Learning, 1990

    1990-01-01

    Reviewed are three computer software packages including "Martin Luther King, Jr.: Instant Replay of History,""Weeds to Trees," and "The New Print Shop, School Edition." Discussed are hardware requirements, costs, grade levels, availability, emphasis, strengths, and weaknesses. (CW)

  17. Software Reviews.

    Science.gov (United States)

    Wulfson, Stephen, Ed.

    1987-01-01

    Reviews seven computer software programs that can be used in science education programs. Describes courseware which deals with muscles and bones, terminology, classifying animals without backbones, molecular structures, drugs, genetics, and shaping the earth's surface. (TW)

  18. Software Reviews.

    Science.gov (United States)

    Dwyer, Donna; And Others

    1989-01-01

    Reviewed are seven software packages for Apple and IBM computers. Included are: "Toxicology"; "Science Corner: Space Probe"; "Alcohol and Pregnancy"; "Science Tool Kit Plus"; Computer Investigations: Plant Growth"; "Climatrolls"; and "Animal Watch: Whales." (CW)

  19. A wide-range metrology AFM and its applications

    Science.gov (United States)

    Lin, Xiaofeng; Zhang, Haijun; Zhang, Dongxian

    2005-02-01

    In view of the fact that the application field of a dual tunneling-unit scanning tunneling microscope (DTU-STM) was strongly limited by sample conductivity, a dual imaging unit atomic force microscope (DIU-AFM) was developed for wide-range nano-metrology. A periodic grating is employed as a reference sample. The DIU-AFM simultaneously scans the grating and a test sample by using one single XY scanner. Their images thus have the same lateral size, and the length of the test sample image can be precisely measured by counting the number of periodic features of the reference grating. We further developed a new method of implementing wide-range nano-metrology. By alternatively moving the XY scanner in the X direction using a step motor, a series of pairs of images are obtained and can be spliced into two wide-range reference and test ones, respectively. Again, the two spliced images are of the same size, and the length of test image can be measured based on the reference grating features. In this way, wide-range metrology with nanometer order accuracy is successfully realized.

  20. An innovative bifocal metrology system for aerospace applications

    Science.gov (United States)

    Bresciani, F.

    2016-11-01

    In this paper an innovative space metrology system which objective is to measure the mutual arrangement between two spacecrafts is descripted. It is a simple and robust system that makes possible relative attitude measurements between 2 satellites in formation flying with coarse and fine accuracies. Generally, in formation flying mission it's necessary to have a satellite attitude control whose accuracy depends on their relative distance. The proposed metrology is based on an innovative optical projective system embedded on satellite 1 and a target composed by several light sources mounted on satellite 2. Optical system concurrently projects on a CCD two images of the target and from relative position of the light sources on the CCD image plane it's possible to detect position and attitude of the S2. Basic element of innovation of this versatile metrology concept is the possibility to work on a very large S/Cs range distance (~10 m-15 km) and to determinate the relative attitude and position of two spacecrafts on all six degree of freedom in a very simple and fast way.

  1. A Knowledge-Navigation System for Dimensional Metrology.

    Science.gov (United States)

    Moncarz, Howard T

    2002-01-01

    Geometric dimensioning and tolerancing (GD&T) is a method to specify the dimensions and form of a part so that it will meet its design intent. GD&T is difficult to master for two main reasons. First, it is based on complex 3D geometric entities and relationships. Second, the geometry is associated with a large, diverse knowledge base of dimensional metrology with many interconnections. This paper describes an approach to create a dimensional metrology knowledge base that is organized around a set of key concepts and to represent those concepts as virtual objects that can be navigated with interactive, computer visualization techniques to access the associated knowledge. The approach can enable several applications. First is the application to convey the definition and meaning of GD&T over a broad range of tolerance types. Second is the application to provide a visualization of dimensional metrology knowledge within a control hierarchy of the inspection process. Third is the application to show the coverage of interoperability standards to enable industry to make decisions on standards development and harmonization efforts. A prototype system has been implemented to demonstrate the principles involved in the approach.

  2. Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

    Science.gov (United States)

    Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

    2014-05-22

    We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

  3. Single-shot adaptive measurement for quantum-enhanced metrology

    Science.gov (United States)

    Palittpongarnpim, Pantita; Wittek, Peter; Sanders, Barry C.

    2016-09-01

    Quantum-enhanced metrology aims to estimate an unknown parameter such that the precision scales better than the shot-noise bound. Single-shot adaptive quantum-enhanced metrology (AQEM) is a promising approach that uses feedback to tweak the quantum process according to previous measurement outcomes. Techniques and formalism for the adaptive case are quite different from the usual non-adaptive quantum metrology approach due to the causal relationship between measurements and outcomes. We construct a formal framework for AQEM by modeling the procedure as a decision-making process, and we derive the imprecision and the Craḿer- Rao lower bound with explicit dependence on the feedback policy. We also explain the reinforcement learning approach for generating quantum control policies, which is adopted due to the optimal policy being non-trivial to devise. Applying a learning algorithm based on differential evolution enables us to attain imprecision for adaptive interferometric phase estimation, which turns out to be SQL when non-entangled particles are used in the scheme.

  4. The future of 2D metrology for display manufacturing

    Science.gov (United States)

    Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

    2016-10-01

    The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

  5. XPS-XRF hybrid metrology enabling FDSOI process

    Science.gov (United States)

    Hossain, Mainul; Subramanian, Ganesh; Triyoso, Dina; Wahl, Jeremy; Mcardle, Timothy; Vaid, Alok; Bello, A. F.; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Pois, Heath; Wang, Ying; Larson, Tom

    2016-03-01

    Planar fully-depleted silicon-on-insulator (FDSOI) technology potentially offers comparable transistor performance as FinFETs. pFET FDOSI devices are based on a silicon germanium (cSiGe) layer on top of a buried oxide (BOX). Ndoped interfacial layer (IL), high-k (HfO2) layer and the metal gate stacks are then successively built on top of the SiGe layer. In-line metrology is critical in precisely monitoring the thickness and composition of the gate stack and associated underlying layers in order to achieve desired process control. However, any single in-line metrology technique is insufficient to obtain the thickness of IL, high-k, cSiGe layers in addition to Ge% and N-dose in one single measurement. A hybrid approach is therefore needed that combines the capabilities of more than one measurement technique to extract multiple parameters in a given film stack. This paper will discuss the approaches, challenges, and results associated with the first-in-industry implementation of XPS-XRF hybrid metrology for simultaneous detection of high-k thickness, IL thickness, N-dose, cSiGe thickness and %Ge, all in one signal measurement on a FDSOI substrate in a manufacturing fab. Strong correlation to electrical data for one or more of these measured parameters will also be presented, establishing the reliability of this technique.

  6. Reusable Software.

    Science.gov (United States)

    1984-03-01

    overseeing reusable software, the Reusable Software Organization ( RUSO ). This author does not feel at this time that establishment of such a specific...49] have not been accompanied by establishment of RUSO -like activities. There is need, however, for assurance that functions which a RUSO might be...assurance 6. establishment and maintenance of reuse archival facilities and activities. Actual establishment of a RUSO is best dictated by size of the

  7. Software Epistemology

    Science.gov (United States)

    2016-03-01

    comprehensive approach for determining software epistemology which significantly advances the state of the art in automated vulnerability discovery...straightforward. First, internet -based repositories of open source software (e.g., FreeBSD ports, GitHub, SourceForge, etc.) are mined Approved for...the fix delta, we attempted to perform the same process to determine if the firmware release present in an Internet -of-Things (IoT) streaming camera

  8. A Software module for pointwise calibration of free form objevts and for uncertainty representation

    DEFF Research Database (Denmark)

    Savio, Enrico; Farmer, A.F.; De Chiffre, Leonardo

    . The Centre for Geometrical Metrology (CGM) at the Technical University of Denmark takes care of free form measurements, in collaboration with DIMEG, University of Padova, Italy. The present report describes a software module, MULTICAL, to be used for the calibration of free form objects. The purpose...... of the software is to calculate the uncertainty of free form measurements according to the method described in the draft standard ISO/WD 15530-6....

  9. A Software module for pointwise calibration of free form objevts and for uncertainty representation

    DEFF Research Database (Denmark)

    Savio, Enrico; Farmer, A.F.; De Chiffre, Leonardo

    . The Centre for Geometrical Metrology (CGM) at the Technical University of Denmark takes care of free form measurements, in collaboration with DIMEG, University of Padova, Italy. The present report describes a software module, MULTICAL, to be used for the calibration of free form objects. The purpose...... of the software is to calculate the uncertainty of free form measurements according to the method described in the draft standard ISO/WD 15530-6....

  10. A Software Tool for Optimal Sizing of PV Systems in Malaysia

    OpenAIRE

    Tamer Khatib; Azah Mohamed; K. Sopian

    2012-01-01

    This paper presents a MATLAB based user friendly software tool called as PV.MY for optimal sizing of photovoltaic (PV) systems. The software has the capabilities of predicting the metrological variables such as solar energy, ambient temperature and wind speed using artificial neural network (ANN), optimizes the PV module/ array tilt angle, optimizes the inverter size and calculate optimal capacities of PV array, battery, wind turbine and diesel generator in hybrid PV systems. The ANN based mo...

  11. Performance of the primary mirror center-of-curvature optical metrology system during cryogenic testing of the JWST Pathfinder telescope

    Science.gov (United States)

    Hadaway, James B.; Wells, Conrad; Olczak, Gene; Waldman, Mark; Whitman, Tony; Cosentino, Joseph; Connolly, Mark; Chaney, David; Telfer, Randal

    2016-07-01

    The James Webb Space Telescope (JWST) primary mirror (PM) is 6.6 m in diameter and consists of 18 hexagonal segments, each 1.5 m point-to-point. Each segment has a six degree-of-freedom hexapod actuation system and a radius of-curvature (RoC) actuation system. The full telescope will be tested at its cryogenic operating temperature at Johnson Space Center. This testing will include center-of-curvature measurements of the PM, using the Center-of-Curvature Optical Assembly (COCOA) and the Absolute Distance Meter Assembly (ADMA). The COCOA includes an interferometer, a reflective null, an interferometer-null calibration system, coarse and fine alignment systems, and two displacement measuring interferometer systems. A multiple-wavelength interferometer (MWIF) is used for alignment and phasing of the PM segments. The ADMA is used to measure, and set, the spacing between the PM and the focus of the COCOA null (i.e. the PM center-of-curvature) for determination of the ROC. The performance of these metrology systems was assessed during two cryogenic tests at JSC. This testing was performed using the JWST Pathfinder telescope, consisting mostly of engineering development and spare hardware. The Pathfinder PM consists of two spare segments. These tests provided the opportunity to assess how well the center-of-curvature optical metrology hardware, along with the software and procedures, performed using real JWST telescope hardware. This paper will describe the test setup, the testing performed, and the resulting metrology system performance. The knowledge gained and the lessons learned during this testing will be of great benefit to the accurate and efficient cryogenic testing of the JWST flight telescope.

  12. [Recommendations on the metrology and the control of the quality of the critical equipments].

    Science.gov (United States)

    Daunizeau, A

    2013-06-01

    Metrology resumes activities which allow the management of results measurement quality. In this paper, we present basic principles of metrology applied to the activities of laboratory medicine. We successively treat general concepts useful for laboratory staff, the interest in the definition of a metrological function and its activities field, the applications in measuring instruments necessary for the exams of medical biology, and the specific documentation control needed.

  13. Accurate in-line CD metrology for nanometer semiconductor manufacturing

    Science.gov (United States)

    Perng, Baw-Ching; Shieh, Jyu-Horng; Jang, S.-M.; Liang, M.-S.; Huang, Renee; Chen, Li-Chien; Hwang, Ruey-Lian; Hsu, Joe; Fong, David

    2006-03-01

    The need for absolute accuracy is increasing as semiconductor-manufacturing technologies advance to sub-65nm nodes, since device sizes are reducing to sub-50nm but offsets ranging from 5nm to 20nm are often encountered. While TEM is well-recognized as the most accurate CD metrology, direct comparison between the TEM data and in-line CD data might be misleading sometimes due to different statistical sampling and interferences from sidewall roughness. In this work we explore the capability of CD-AFM as an accurate in-line CD reference metrology. Being a member of scanning profiling metrology, CD-AFM has the advantages of avoiding e-beam damage and minimum sample damage induced CD changes, in addition to the capability of more statistical sampling than typical cross section metrologies. While AFM has already gained its reputation on the accuracy of depth measurement, not much data was reported on the accuracy of CD-AFM for CD measurement. Our main focus here is to prove the accuracy of CD-AFM and show its measuring capability for semiconductor related materials and patterns. In addition to the typical precision check, we spent an intensive effort on examining the bias performance of this CD metrology, which is defined as the difference between CD-AFM data and the best-known CD value of the prepared samples. We first examine line edge roughness (LER) behavior for line patterns of various materials, including polysilicon, photoresist, and a porous low k material. Based on the LER characteristics of each patterning, a method is proposed to reduce its influence on CD measurement. Application of our method to a VLSI nanoCD standard is then performed, and agreement of less than 1nm bias is achieved between the CD-AFM data and the standard's value. With very careful sample preparations and TEM tool calibration, we also obtained excellent correlation between CD-AFM and TEM for poly-CDs ranging from 70nm to 400nm. CD measurements of poly ADI and low k trenches are also

  14. Metrological Needs for Monitoring Aquatic Environments: From the Demonstration of Metrological Traceability to the Decision Making Process

    Science.gov (United States)

    Lardy-Fontan, Sophie; Guigues, Nathalie; Lalere, Béatrice; Vaslin-Reimann, Sophie

    2014-08-01

    In Europe, the implementation of the Water Framework Directive WFD, in 2001, marks a strong standpoint. In addition to its objectives of a return to good chemical and good ecological status by the year 2015, it fixes the achievement of trends over space and time. The new requirements that arise from the WFD put considerable financial pressure on water management authorities. Because the overall decision-making process relies most of the time on acquired data, it puts considerable pressures on the display of high quality biological as well as chemical environmental measurements. However, performing measurements implies that i) the demonstration of their metrological traceability ii) the evidence of their achievement thanks to accurate and sensitive analytical methods and iii) their statement with a reliable estimate of expanded uncertainty is thoroughly addressed. Moreover, the measurement representativeness, especially in highly dynamic environment, is of prime interest in a context where comparability over space and time is needed. As a consequence, considerable challenges are dwelt on metrologists with great emphasis on parameters that are under regulation. This paper will discuss a panorama of the unavoidable metrological questions that have to be addressed: from the definition of the measurand to the final estimation of uncertainty; from the initial performances demonstration of methods to the final demonstration of mastery and capabilities through inter comparison laboratories and reference materials. A focus will be made on upcoming alternative monitoring approaches that are seldom addressed from a metrological point of view.

  15. MIAWARE Software

    DEFF Research Database (Denmark)

    Wilkowski, Bartlomiej; Pereira, Oscar N. M.; Dias, Paulo

    2008-01-01

    This article presents MIAWARE, a software for Medical Image Analysis With Automated Reporting Engine, which was designed and developed for doctor/radiologist assistance. It allows to analyze an image stack from computed axial tomography scan of lungs (thorax) and, at the same time, to mark all...... pathologies on images and report their characteristics. The reporting process is normalized - radiologists cannot describe pathological changes with their own words, but can only use some terms from a specific vocabulary set provided by the software. Consequently, a normalized radiological report...... is automatically generated. Furthermore, MIAWARE software is accompanied with an intelligent search engine for medical reports, based on the relations between parts of the lungs. A logical structure of the lungs is introduced to the search algorithm through the specially developed ontology. As a result...

  16. Software engineering

    CERN Document Server

    Thorin, Marc

    1985-01-01

    Software Engineering describes the conceptual bases as well as the main methods and rules on computer programming. This book presents software engineering as a coherent and logically built synthesis and makes it possible to properly carry out an application of small or medium difficulty that can later be developed and adapted to more complex cases. This text is comprised of six chapters and begins by introducing the reader to the fundamental notions of entities, actions, and programming. The next two chapters elaborate on the concepts of information and consistency domains and show that a proc

  17. [Software version and medical device software supervision].

    Science.gov (United States)

    Peng, Liang; Liu, Xiaoyan

    2015-01-01

    The importance of software version in the medical device software supervision does not cause enough attention at present. First of all, the effect of software version in the medical device software supervision is discussed, and then the necessity of software version in the medical device software supervision is analyzed based on the discussion of the misunderstanding of software version. Finally the concrete suggestions on software version naming rules, software version supervision for the software in medical devices, and software version supervision scheme are proposed.

  18. Educational Software.

    Science.gov (United States)

    Northwest Regional Educational Lab., Portland, OR.

    The third session of IT@EDU98 consisted of five papers on educational software and was chaired by Tran Van Hao (University of Education, Ho Chi Minh City, Vietnam). "Courseware Engineering" (Nguyen Thanh Son, Ngo Ngoc Bao Tran, Quan Thanh Tho, Nguyen Hong Lam) briefly describes the use of courseware. "Machine Discovery Theorems in Geometry: A…

  19. Software Patents.

    Science.gov (United States)

    Burke, Edmund B.

    1994-01-01

    Outlines basic patent law information that pertains to computer software programs. Topics addressed include protection in other countries; how to obtain patents; kinds of patents; duration; classes of patentable subject matter, including machines and processes; patentability searches; experimental use prior to obtaining a patent; and patent…

  20. Software Systems

    Institute of Scientific and Technical Information of China (English)

    崔涛; 周淼

    1996-01-01

    The information used with computers is known as software and includesprograms and data. Programs are sets of instructions telling the computerwhat operations have to be carried out and in what order they should be done. Specialised programs which enable the computer to be used for particularpurposes are called applications programs. A collection of these programs kept

  1. Software Reviews.

    Science.gov (United States)

    Science and Children, 1990

    1990-01-01

    Reviewed are seven computer software packages for IBM and/or Apple Computers. Included are "Windows on Science: Volume 1--Physical Science"; "Science Probe--Physical Science"; "Wildlife Adventures--Grizzly Bears"; "Science Skills--Development Programs"; "The Clean Machine"; "Rock Doctor"; and "Geology Search." Cost, quality, hardware, and…

  2. Software Review.

    Science.gov (United States)

    McGrath, Diane, Ed.

    1989-01-01

    Reviewed is a computer software package entitled "Audubon Wildlife Adventures: Grizzly Bears" for Apple II and IBM microcomputers. Included are availability, hardware requirements, cost, and a description of the program. The murder-mystery flavor of the program is stressed in this program that focuses on illegal hunting and game management. (CW)

  3. 77 FR 25406 - Consortium on “Concrete Rheology: Enabling Metrology (CREME)”: Membership Fee Update

    Science.gov (United States)

    2012-04-30

    ... From the Federal Register Online via the Government Publishing Office DEPARTMENT OF COMMERCE National Institute of Standards and Technology Consortium on ``Concrete Rheology: Enabling Metrology (CREME... NIST/Industry Consortium on Concrete Rheology: Enabling Metrology (CREME)''. The notice stated that...

  4. Spectroscopic metrology for isotope composition measurements and transfer standards

    Science.gov (United States)

    Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

    2017-04-01

    The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H

  5. Metrology of human-based and other qualitative measurements

    Science.gov (United States)

    Pendrill, Leslie; Petersson, Niclas

    2016-09-01

    The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component

  6. Target-Tracking Camera for a Metrology System

    Science.gov (United States)

    Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

    2009-01-01

    An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

  7. Fringe pattern analysis for optical metrology theory, algorithms, and applications

    CERN Document Server

    Servin, Manuel; Padilla, Moises

    2014-01-01

    The main objective of this book is to present the basic theoretical principles and practical applications for the classical interferometric techniques and the most advanced methods in the field of modern fringe pattern analysis applied to optical metrology. A major novelty of this work is the presentation of a unified theoretical framework based on the Fourier description of phase shifting interferometry using the Frequency Transfer Function (FTF) along with the theory of Stochastic Process for the straightforward analysis and synthesis of phase shifting algorithms with desired properties such

  8. Scientific language and metrology; El lenguaje cientificio y la metrologia

    Energy Technology Data Exchange (ETDEWEB)

    Campo Maldonado, D. del; Martin Blasco, B.; Prieto Esteban, E.

    2011-07-01

    The International System of Units (SI) reflects all the decisions and recommendations regarding units of measurement issued by the General Conference on Weights and Measures, including rules for writing the names and symbols of measurement units and for expressing the values of quantities. Even though the SI is internationally accepted and is the declared legal system whose use is obligatory in Spain, the Spanish Metrology Centre has been detecting an incorrect use of the units of measurement both in textbooks at all levels and in scientific articles. (Author) 5 refs.

  9. Laser metrology in fluid mechanics granulometry, temperature and concentration measurements

    CERN Document Server

    Boutier, Alain

    2013-01-01

    In fluid mechanics, non-intrusive measurements are fundamental in order to improve knowledge of the behavior and main physical phenomena of flows in order to further validate codes.The principles and characteristics of the different techniques available in laser metrology are described in detail in this book.Velocity, temperature and concentration measurements by spectroscopic techniques based on light scattered by molecules are achieved by different techniques: laser-induced fluorescence, coherent anti-Stokes Raman scattering using lasers and parametric sources, and absorption sp

  10. Metrology measurements for large-aperture VPH gratings

    Science.gov (United States)

    Zheng, Jessica R.; Gers, Luke; Heijmans, Jeroen

    2013-09-01

    The High Efficiency and Resolution Multi Element Spectrograph (HERMES) for the Australian Astronomical Observatory (AAO) uses four large aperture, high angle of incidence volume phase holographic gratings (VPHG) for high resolution `Galactic archaeology' spectroscopy. The large clear aperture, the high diffraction efficiency, the line frequency homogeneity, and mosaic alignment made manufacturing and testing challenging. We developed new metrology systems at the AAO to verify the performance of these VPH gratings. The measured diffraction efficiencies and line frequency of the VPH gratings received so far meet the vendor's provided data. The wavefront quality for the Blue VPH grating is good but the Green and Red VPH gratings need to be post polishing.

  11. Statistical analysis of the metrological properties of float glass

    Science.gov (United States)

    Yates, Brian W.; Duffy, Alan M.

    2008-08-01

    The radius of curvature, slope error, surface roughness and associated height distribution and power spectral density of uncoated commercial float glass samples have been measured in our Canadian Light Source Optical Metrology Facility, using our Micromap-570 surface profiler and long trace profilometer. The statistical differences in these parameters have been investigated between the tin and air sides of float glass. The effect of soaking the float glass in sulfuric acid to try to dissolve the tin contamination has also been investigated, and untreated and post-treatment surface roughness measurements compared. We report the results of our studies on these float glass samples.

  12. Electrical test prediction using hybrid metrology and machine learning

    Science.gov (United States)

    Breton, Mary; Chao, Robin; Muthinti, Gangadhara Raja; de la Peña, Abraham A.; Simon, Jacques; Cepler, Aron J.; Sendelbach, Matthew; Gaudiello, John; Emans, Susan; Shifrin, Michael; Etzioni, Yoav; Urenski, Ronen; Lee, Wei Ti

    2017-03-01

    Electrical test measurement in the back-end of line (BEOL) is crucial for wafer and die sorting as well as comparing intended process splits. Any in-line, nondestructive technique in the process flow to accurately predict these measurements can significantly improve mean-time-to-detect (MTTD) of defects and improve cycle times for yield and process learning. Measuring after BEOL metallization is commonly done for process control and learning, particularly with scatterometry (also called OCD (Optical Critical Dimension)), which can solve for multiple profile parameters such as metal line height or sidewall angle and does so within patterned regions. This gives scatterometry an advantage over inline microscopy-based techniques, which provide top-down information, since such techniques can be insensitive to sidewall variations hidden under the metal fill of the trench. But when faced with correlation to electrical test measurements that are specific to the BEOL processing, both techniques face the additional challenge of sampling. Microscopy-based techniques are sampling-limited by their small probe size, while scatterometry is traditionally limited (for microprocessors) to scribe targets that mimic device ground rules but are not necessarily designed to be electrically testable. A solution to this sampling challenge lies in a fast reference-based machine learning capability that allows for OCD measurement directly of the electrically-testable structures, even when they are not OCD-compatible. By incorporating such direct OCD measurements, correlation to, and therefore prediction of, resistance of BEOL electrical test structures is significantly improved. Improvements in prediction capability for multiple types of in-die electrically-testable device structures is demonstrated. To further improve the quality of the prediction of the electrical resistance measurements, hybrid metrology using the OCD measurements as well as X-ray metrology (XRF) is used. Hybrid metrology

  13. Metrology system for the Terrestrial Planet Finder Coronagraph

    Science.gov (United States)

    Shaklin, Stuart; Marchen, Luis; Zhao, Feng; Peters, Robert D.; Ho, Tim; Holmes, Buck

    2004-01-01

    The Terrestrial Planet Finder (TPF) employs an aggressive coronagraph designed to obtain better than 1e-10 contrast inside the third Airy ring. Minute changes in low-order aberration content scatter significant light at this position. One implication is the requirement to control low-order aberrations induced by motion of the secondary mirror relative to the primary mirror; sub-nanometer relative positional stability is required. We propose a 6-beam laser truss to monitor the relative positions of the two mirrors. The truss is based on laser metrology developed for the Space Interferometry Mission.

  14. Metrology System for a Large, Somewhat Flexible Telescope

    Science.gov (United States)

    Liebe, Carl Christian; Bartman, Randall; Cook, Walter; Craig, William

    2009-01-01

    A proposed metrology system would be incorporated into a proposed telescope that would include focusing optics on a rigid bench connected via a deployable mast to another rigid bench holding a focal-plane array of photon counting photodetectors. Deformations of the deployable mast would give rise to optical misalignments that would alter the directions (and, hence, locations) of incidence of photons on the focal plane. The metrology system would measure the relative displacement of the focusing- optics bench and the focal-plane array bench. The measurement data would be used in post-processing of the digitized photodetector outputs to compensate for the mast-deformation-induced changes in the locations of incidence of photons on the focal plane, thereby making it possible to determine the original directions of incidence of photons with greater accuracy. The proposed metrology system is designed specifically for the Nuclear Spectroscopic Telescope Array (NuSTAR) a proposed spaceborne x-ray telescope. The basic principles of design and operation are also applicable to other large, somewhat flexible telescopes, both terrestrial and spaceborne. In the NuSTAR, the structural member connecting the optical bench and the photodetector array would be a 10-m-long deployable mast, and there is a requirement to keep errors in measured directions of incidence of photons below 10 arc seconds (3 sigma). The proposed system would include three diode lasers that would be mounted on the focusing-optics bench. For clarity, only one laser is shown in the figure, which is a greatly simplified schematic diagram of the system. Each laser would be aimed at a position-sensitive photodiode that would be mounted on the detector bench alongside the aforementioned telescope photodetector array. The diode lasers would operate at a wavelength of 830 nm, each at a power of 200 mW. Each laser beam would be focused to a spot of .1-mm diameter on the corresponding position-sensitive photodiode. To

  15. Quantum enhanced metrology and the geometry of quantum channels

    CERN Document Server

    Demkowicz-Dobrzanski, Rafal; Kolodynski, Jan

    2012-01-01

    Lower bounds on the estimation uncertainty are derived for quantum metrological schemes in the presence of decoherence showing that Heisenberg scaling is generically lost even for infinitesimal level of noise. Unlike in other methods, calculation of the bounds is straightforward and requires only a simple analysis of the mathematical structure of the decoherence process. In some models, e.g. atomic clocks frequency calibration with dephasing, calculation may be performed using an intuitive geometric picture. All that is necessary is a "distance" of a point representing the decoherence process from the boundary of the set of all quantum channels.

  16. Calibration of space instruments at the Metrology Light Source

    Energy Technology Data Exchange (ETDEWEB)

    Klein, R., E-mail: roman.klein@ptb.de; Fliegauf, R.; Gottwald, A.; Kolbe, M.; Paustian, W.; Reichel, T.; Richter, M.; Thornagel, R.; Ulm, G. [Physikalisch-Technische Bundesanstalt (PTB), Berlin (Germany)

    2016-07-27

    PTB has more than 20 years of experience in the calibration of space-based instruments using synchrotron radiation to cover the UV, VUV and X-ray spectral range. New instrumentation at the electron storage ring Metrology Light Source (MLS) opens up extended calibration possibilities within this framework. In particular, the set-up of a large vacuum vessel that can accommodate entire space instruments opens up new prospects. Moreover, a new facility for the calibration of radiation transfer source standards with a considerably extended spectral range has been put into operation. Besides, characterization and calibration of single components like e.g. mirrors, filters, gratings, and detectors is continued.

  17. Noninvasive spatial metrology of single-atom devices.

    Science.gov (United States)

    Mohiyaddin, Fahd A; Rahman, Rajib; Kalra, Rachpon; Klimeck, Gerhard; Hollenberg, Lloyd C L; Pla, Jarryd J; Dzurak, Andrew S; Morello, Andrea

    2013-05-01

    The exact location of a single dopant atom in a nanostructure can influence or fully determine the functionality of highly scaled transistors or spin-based devices. We demonstrate here a noninvasive spatial metrology technique, based on the microscopic modeling of three electrical measurements on a single-atom (phosphorus in silicon) spin qubit device: hyperfine coupling, ground state energy, and capacitive coupling to nearby gates. This technique allows us to locate the qubit atom with a precision of ±2.5 nm in two directions and ±15 nm in the third direction, which represents a 1500-fold improvement with respect to the prefabrication statistics obtainable from the ion implantation parameters.

  18. EDITORIAL: Standard Materials and Metrology for Nanotechnology (SMAM-2)

    Science.gov (United States)

    Ichimura, Shingo; Kurosawa, Tomizo; Fujimoto, Toshiyuki; Nonaka, Hidehiko

    2007-09-01

    This issue of Measurement Science and Technology (MST) contains three papers presented at the second international symposium on Standard Materials and Metrology for Nanotechnology (SMAM-2), held in the Akihabara Convention Hall in Tokyo, Japan, on 25 and 26 May 2006. The SMAM symposium aims to emphasize the importance of standard materials and metrology (SM/M) for the development of nanotechnology, which is expected to be the most promising driving force for the development of advanced industrial science/technology in various fields. New fabrication processes based on nanotechnology will become really powerful when the processes are reproducible and reliable. The SM/M that have been developed for use in nano-scale characterization are therefore the key tools for the establishment of reliability in the areas of information, environment and biotechnology, where the application of nanotechnology is essential for their development. The symposium had four sessions featuring the most important issues in the field of SM/M: (I) Nanotechnology Standardization, (II) SM/M for Nano-particles and Nano-pores, (III) SM/M for Nanostructure Evaluation, (IV) SM/M for Thin-film Characterization. A total of 29 papers had been submitted to the SMAM-2 Publishing Committee and six papers were tentatively selected by the committee to forward to the MST editors for publication in this journal. The three papers published in this issue are epoch-making in that they present new methods and knowledge for the standard materials and metrology especially developed for nanotechnology. We hope the papers will show readers how important standard materials and metrology are for the development of nanotechnology. We appreciate very much the important contribution of those who refereed the manuscripts and we particularly want to thank the MST staff for helping in publishing this special feature. Finally we expect SMAM-3 to be held two years after SMAM-2 and we hope to attract many more participants and

  19. Management of metrology in measuring of the displacement of building construction

    Directory of Open Access Journals (Sweden)

    Jiří Kratochvíl

    2007-06-01

    Full Text Available The metrology management of the measurement of the displacement of building construction is not regulated in the standard ČSN ISO 73 0405 - Measurement of the displacement of building construction. But the metrology management has to be included in the project of measurement of the displacement (Stage of project. Then we have to pay an attention to the metrological management during this measurement (Stage of realization and during the evaluation of this measurement (Stage of evaluation. We have to insist on the subsequent improving of metrology management within the frame of the next project (so-called feedback. The metrology management in the measurement of the displacement during the stages should be based on an application of statutory instruments and technical standards. We should insist especially on the system of standards for the quality control ISO 9000. Considering specialities of geodetic measurements it is necessary to adapt the metrology management. That is why it will differ from the metrology management in other fields of knowledge. This paper includes some steps of metrological provision which must not be ignored.

  20. Dimensional quality control of Ti-Ni dental file by optical coordinate metrology and computed tomography

    DEFF Research Database (Denmark)

    Yagüe-Fabra, J.A.; Tosello, Guido; Ontiveros, S.

    2014-01-01

    Endodontic dental files usually present complex 3D geometries, which make the complete measurement of the component very challenging with conventional micro metrology tools. Computed Tomography (CT) can represent a suitable alternative solution to micro metrology tools based on optical and tactil...

  1. National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN; Laboratorio Nacional de Metrologia das Radiacoes Ionizantes

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1992-12-31

    The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs.

  2. Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

    Science.gov (United States)

    Kim, Min-Suk; Won, Hwa-Yeon; Jeong, Jong-Mun; Böcker, Paul; Vergaij-Huizer, Lydia; Kupers, Michiel; Jovanović, Milenko; Sochal, Inez; Ryan, Kevin; Sun, Kyu-Tae; Lim, Young-Wan; Byun, Jin-Moo; Kim, Gwang-Gon; Suh, Jung-Joon

    2016-03-01

    In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrology at the edge of the wafer, to feed field-by-field corrections. Although field-by-field corrections can be effective in reducing localized overlay errors, the requirement for dense metrology to determine the corrections can become a limiting factor due to a significant increase of metrology time and cost. In this study, a more cost-effective solution has been found in extending the regular correction model with an edge-specific component. This new overlay correction model can be driven by an optimized, sparser sampling especially at the wafer edge area, and also allows for a reduction of noise propagation. Lithography correction potential has been maximized, with significantly less metrology needs. Evaluations have been performed, demonstrating the benefit of edge models in terms of on-product overlay performance, as well as cell based overlay performance based on metrology-to-cell matching improvements. Performance can be increased compared to POR modeling and sampling, which can contribute to (overlay based) yield improvement. Based on advanced modeling including edge components, metrology requirements have been optimized, enabling integrated metrology which drives down overall metrology fab footprint and lithography cycle time.

  3. Nuclear Technology. Course 27: Metrology. Module 27-8, The Total Measurement System.

    Science.gov (United States)

    General Physics Corp., Columbia, MD.

    This eighth in a series of eight modules for a course titled Metrology describes the overall metrology program and the associated typical responsibilities of the quality assurance/quality control technician. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4)…

  4. Nuclear Technology. Course 27: Metrology. Module 27-8, The Total Measurement System.

    Science.gov (United States)

    General Physics Corp., Columbia, MD.

    This eighth in a series of eight modules for a course titled Metrology describes the overall metrology program and the associated typical responsibilities of the quality assurance/quality control technician. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4)…

  5. Fabrication of metrology test structures with helium ion beam direct write

    Science.gov (United States)

    Lee, Chien-Lin; Chien, Sheng-Wei; Chen, Sheng-Yung; Liu, Chun-Hung; Tsai, Kuen-Yu; Li, Jia-Han; Shew, Bor-Yuan; Hong, Chit-Sung; Lee, Chao-Te

    2017-03-01

    The availability of metrology solutions, one of the key factors to drive leading edge semiconductor devices and processes, can be confronted with difficulties in the advanced node. For developing new metrology solutions, high quality test structures fabricated at specific sizes are needed. Conventional resist-based lithography have been utilized to manufacture such samples. However, it can encounter significant resolution difficulties or requiring complicated optimization process for advanced technology node. In this work, potential of helium ion beam direct milling (HIBDM) for fabricating metrology test structures with programmed imperfection is investigated. Features down to 5 nm are resolvable without implementing any optimization method. Preliminary results have demonstrated that HIBDM can be a promising alternative to fabricate metrology test structures for advanced metrology solutions in sub 10 nm node.

  6. A low cost scheme for high precision dual-wavelength laser metrology

    CERN Document Server

    Kok, Yitping; Robertson, J Gordon; Tuthill, Peter G; Warrington, Benjamin A; Tango, William J

    2013-01-01

    A novel method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dual-wavelength metrology which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measurement. Although the method may be applicable to a variety of circumstances, the specific application where this metrology is essential is in an astrometric optical long baseline stellar interferometer dedicated to precise measurement of stellar positions. In our example application of this metrology to a narrow-angle astrometric interferometer, measurement of nanometer precision could be achieved without frequency-stabilized lasers although the use of such lasers would extend the range of optical path length the metrology can accurately measure. Implementation of the method requires very little additional optics or el...

  7. EPIQR software

    Energy Technology Data Exchange (ETDEWEB)

    Flourentzos, F. [Federal Institute of Technology, Lausanne (Switzerland); Droutsa, K. [National Observatory of Athens, Athens (Greece); Wittchen, K.B. [Danish Building Research Institute, Hoersholm (Denmark)

    1999-11-01

    The support of the EPIQR method is a multimedia computer program. Several modules help the users of the method to treat the data collected during a diagnosis survey, to set up refurbishment scenario and calculate their cost or energy performance, and finally to visualize the results in a comprehensive way and to prepare quality reports. This article presents the structure and the main features of the software. (au)

  8. EPIQR software

    Energy Technology Data Exchange (ETDEWEB)

    Flourentzos, F. [Federal Institute of Technology-Lausanne (EPFL), Solar Energy and Building Physics Laboratory (LESO-PB), Lausanne (Switzerland); Droutsa, K. [National Observatory of Athens, Institute of Meteorology and Physics of Atmospheric Environment, Group Energy Conservation, Athens (Greece); Wittchen, K.B. [Danish Building Research Institute, Division of Energy and Indoor Environment, Hoersholm, (Denmark)

    2000-07-01

    The support of the EPIQR method is a multimedia computer program. Several modules help the users of the method to treat the data collected during a diagnosis survey, to set up refurbishment scenarios and calculate their cost or energy performance, and finally to visualize the results in a comprehensive way and to prepare quality reports. This article presents the structure and the main features of the software. (author)

  9. Software preservation

    Directory of Open Access Journals (Sweden)

    Tadej Vodopivec

    2011-01-01

    Full Text Available Comtrade Ltd. covers a wide range of activities related to information and communication technologies; its deliverables include web applications, locally installed programs,system software, drivers, embedded software (used e.g. in medical devices, auto parts,communication switchboards. Also the extensive knowledge and practical experience about digital long-term preservation technologies have been acquired. This wide spectrum of activities puts us in the position to discuss the often overlooked aspect of the digital preservation - preservation of software programs. There are many resources dedicated to digital preservation of digital data, documents and multimedia records,but not so many about how to preserve the functionalities and features of computer programs. Exactly these functionalities - dynamic response to inputs - render the computer programs rich compared to documents or linear multimedia. The article opens the questions on the beginning of the way to the permanent digital preservation. The purpose is to find a way in the right direction, where all relevant aspects will be covered in proper balance. The following questions are asked: why at all to preserve computer programs permanently, who should do this and for whom, when we should think about permanent program preservation, what should be persevered (such as source code, screenshots, documentation, and social context of the program - e.g. media response to it ..., where and how? To illustrate the theoretic concepts given the idea of virtual national museum of electronic banking is also presented.

  10. Evaluating a hybrid three-dimensional metrology system: merging data from optical and touch probe devices

    Science.gov (United States)

    Gerde, Janice R.; Christens-Barry, William A.

    2011-08-01

    In a project to meet requirements for CBP Laboratory analysis of footwear under the Harmonized Tariff Schedule of the United States (HTSUS), a hybrid metrology system comprising both optical and touch probe devices has been assembled. A unique requirement must be met: To identify the interface-typically obscured in samples of concern-of the "external surface area upper" (ESAU) and the sole without physically destroying the sample. The sample outer surface is determined by discrete point cloud coordinates obtained using laser scanner optical measurements. Measurements from the optically inaccessible insole region are obtained using a coordinate measuring machine (CMM). That surface similarly is defined by point cloud data. Mathematically, the individual CMM and scanner data sets are transformed into a single, common reference frame. Custom software then fits a polynomial surface to the insole data and extends it to intersect the mesh fitted to the outer surface point cloud. This line of intersection defines the required ESAU boundary, thus permitting further fractional area calculations to determine the percentage of materials present. With a draft method in place, and first-level method validation underway, we examine the transformation of the two dissimilar data sets into the single, common reference frame. We also will consider the six previously-identified potential error factors versus the method process. This paper reports our on-going work and discusses our findings to date.

  11. Software Engineering to Professionalize Software Development

    Directory of Open Access Journals (Sweden)

    Juan Miguel Alonso

    2011-12-01

    Full Text Available The role, increasingly important, that plays the software in the systems with widespread effects presents new challenges for the formation of Software Engineers. Not only because social dependence software is increasing, but also because the character of software development is also changing and with it the demands for software developers certified. In this paper are propose some challenges and aspirations that guide the learning processes Software Engineering and help to identify the need to train professionals in software development.

  12. Metrology, applications and methods with high energy CT systems

    Energy Technology Data Exchange (ETDEWEB)

    Uhlmann, N.; Voland, V.; Salamon, M.; Hebele, S.; Boehnel, M.; Reims, N.; Schmitt, M.; Kasperl, S. [Fraunhofer IIS/EZRT, Development Center X-Ray Technology, Flugplatzstrasse 75, 90768 Fürth (Germany); Hanke, R. [Chair of X-ray Microscopy, University of Würzburg - Physics and Astronomy (Germany)

    2014-02-18

    The increase of Computed Tomography (CT) as an applicable metrology and Non Destructive Testing (NDT) method raises interest on developing the application fields to larger objects, which were rarely used in the past due to their requirements on the imaging system. Especially the classical X-ray generation techniques based on standard equipment restricted the applications of CT to typical material penetration lengths of only a few cm of steel. Even with accelerator technology that offers a suitable way to overcome these restrictions just the 2D radioscopy technique found a widespread application. Beside the production and detection of photons in the MeV range itself, the achievable image quality is limited using standard detectors due to the dominating absorption effect of Compton Scattering at high energies. Especially for CT reconstruction purposes these effects have to be considered on the development path from 2D to 3D imaging. Most High Energy CT applications are therefore based on line detectors shielding scattered radiation to a maximum with an increase in imaging quality but with time consuming large volume scan capabilities. In this contribution we present the High-Energy X-ray Imaging project at the Fraunhofer Development Centre for X-ray Technology with the characterization and the potential of the CT-system according to metrological and other application capabilities.

  13. Recent progress in high pressure metrology in Europe

    Directory of Open Access Journals (Sweden)

    Sabuga Wladimir

    2014-01-01

    Full Text Available Five European national metrology institutes in collaboration with a university, a research institute and five industrial companies are working on a joint research project within a framework of the European Metrology Research Programme aimed at development of 1.6 GPa primary and 1.5 GPa transfer pressure standards. Two primary pressure standards were realised as pressure-measuring multipliers, each consisting of a low pressure and a high pressure (HP piston-cylinder assembly (PCA. A special design of the HP PCAs was developed in which a tungsten carbide cylinder is supported by two thermally shrunk steel sleeves and, additionally, by jacket pressure applied to the outside of the outer sleeve. Stress-strain finite element analysis (FEA was performed to predict behaviour of the multipliers and a pressure generation system. With FEA, the pressure distortion coefficient was determined, taking into account irregularities of the piston-cylinder gap. Transfer pressure standards up to 1.5 GPa are developed on the basis of modern 1.5 GPa pressure transducers. This project shall solve a discrepancy between the growing needs of the industry demanding precise traceable calibrations of the high pressure transducers and the absence of adequate primary standards for pressures higher than 1 GPa in the European Union today.

  14. Metrology systems of Hobby-Eberly Telescope wide field upgrade

    Science.gov (United States)

    Lee, Hanshin; Hill, Gary J.; Cornell, Mark E.; Vattiat, Brian L.; Perry, Dave M.; Rafferty, Tom H.; Taylor, Trey; Hart, Michael; Rafal, Marc D.; Savage, Richard D.

    2012-09-01

    The Hobby-Eberly Telescope (HET) Wide-Field Upgrade (WFU) will be equipped with new closed-loop metrology systems to actively control the optical alignment of the new four-mirror Wide-Field Corrector (WFC) as it tracks sidereal motion with respect to the fixed primary mirror. These systems include a tip/tilt camera (TTCam), distance measuring interferometers (DMI), guide probes (GP), and wavefront sensors (WFS). While the TTCam and DMIs are to monitor the mechanical alignment of the WFC, the WFSs and GPs will produce direct measurement of the optical alignment of the WFC with respect to the HET primary mirror. Together, these systems provide fully redundant alignment and pointing information for the telescope, thereby keeping the WFC in focus and suppressing alignment driven field aberrations. In addition to these closed-loop metrology systems, we will have a pupil viewing camera (PVCam) and a calibration wavefront sensor (CWFS). The PVCam will be used for occasional reflectance measurement of the HET primary mirror segments in the standard R,G,B colors. The CWFS will provide the reference wavefront signal against which the other two WFS are calibrated. We describe the current snapshot of these systems and discuss lab/on-sky performance test results of the systems.

  15. Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

    Science.gov (United States)

    Bösemann, Werner

    2016-06-01

    New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  16. Advanced Metrology for Characterization of Magnetic Tunnel Junctions

    DEFF Research Database (Denmark)

    Kjær, Daniel

    as it is believed to have the potential of becoming a truly universal memory solution dominant within all fields of memory application. A decade ago the company CAPRES A/S introduced the so-called CIPTech, which is a metrology tool utilizing micro four-point probes (M4PPs) and a method known as current in...... of this project has been to provide cheaper, faster and more precise metrology for MTJs. This goal has been achieved in part by the demonstration of a static field CIPT method, which allows us to reduce the measurement time by a factor of 5, by measuring only RA thus excluding TMR. This enhancement is obtained....... The standard deviation of the static in-line position error for measurements with Au coated electrodes on Ru thin film samples was found to be in the range from 3.9 nm to 7.5 nm. The standard deviation of the dynamic in-line position error was shown to be small ~3 Å and only detectable in measurements...

  17. Overlay metrology solutions in a triple patterning scheme

    Science.gov (United States)

    Leray, Philippe; Mao, Ming; Baudemprez, Bart; Amir, Nuriel

    2015-03-01

    Overlay metrology tool suppliers are offering today several options to their customers: Different hardware (Image Based Overlay or Diffraction Based Overlay), different target designs (with or without segmentation) or different target sizes (from 5 um to 30 um). All these variations are proposed to resolve issues like robustness of the target towards process variations, be more representative of the design or increase the density of measurements. In the frame of the development of a triple patterning BEOL scheme of 10 nm node layer, we compare IBO targets (standard AIM, AIMid and multilayer AIMid). The metrology tools used for the study are KLA-Tencor's nextgeneration Archer 500 system (scatterometry- and imaging-based measurement technologies on the same tool). The overlay response and fingerprint of these targets will be compared using a very dense sampling (up to 51 pts per field). The benefit of indie measurements compared to the traditional scribes is discussed. The contribution of process effects to overlay values are compared to the contribution of the performance of the target. Different targets are combined in one measurement set to benefit from their different strengths (performance vs size). The results are summarized and possible strategies for a triple patterning schemes are proposed.

  18. Ice flood velocity calculating approach based on single view metrology

    Science.gov (United States)

    Wu, X.; Xu, L.

    2017-02-01

    Yellow River is the river in which the ice flood occurs most frequently in China, hence, the Ice flood forecasting has great significance for the river flood prevention work. In various ice flood forecast models, the flow velocity is one of the most important parameters. In spite of the great significance of the flow velocity, its acquisition heavily relies on manual observation or deriving from empirical formula. In recent years, with the high development of video surveillance technology and wireless transmission network, the Yellow River Conservancy Commission set up the ice situation monitoring system, in which live videos can be transmitted to the monitoring center through 3G mobile networks. In this paper, an approach to get the ice velocity based on single view metrology and motion tracking technique using monitoring videos as input data is proposed. First of all, River way can be approximated as a plane. On this condition, we analyze the geometry relevance between the object side and the image side. Besides, we present the principle to measure length in object side from image. Secondly, we use LK optical flow which support pyramid data to track the ice in motion. Combining the result of camera calibration and single view metrology, we propose a flow to calculate the real velocity of ice flood. At last we realize a prototype system by programming and use it to test the reliability and rationality of the whole solution.

  19. X-ray pulse wavefront metrology using speckle tracking

    Energy Technology Data Exchange (ETDEWEB)

    Berujon, Sebastien, E-mail: berujon@esrf.eu; Ziegler, Eric; Cloetens, Peter [European Synchrotron Radiation Facility, BP-220, F-38043 Grenoble (France)

    2015-05-09

    The theoretical description and experimental implementation of a speckle-tracking-based instrument which permits the characterisation of X-ray pulse wavefronts. An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology.

  20. Diffraction-based overlay metrology for double patterning technologies

    Science.gov (United States)

    Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

    2009-03-01

    The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

  1. Data fusion for accurate microscopic rough surface metrology.

    Science.gov (United States)

    Chen, Yuhang

    2016-06-01

    Data fusion for rough surface measurement and evaluation was analyzed on simulated datasets, one with higher density (HD) but lower accuracy and the other with lower density (LD) but higher accuracy. Experimental verifications were then performed on laser scanning microscopy (LSM) and atomic force microscopy (AFM) characterizations of surface areal roughness artifacts. The results demonstrated that the fusion based on Gaussian process models is effective and robust under different measurement biases and noise strengths. All the amplitude, height distribution, and spatial characteristics of the original sample structure can be precisely recovered, with better metrological performance than any individual measurements. As for the influencing factors, the HD noise has a relatively weaker effect as compared with the LD noise. Furthermore, to enable an accurate fusion, the ratio of LD sampling interval to surface autocorrelation length should be smaller than a critical threshold. In general, data fusion is capable of enhancing the nanometrology of rough surfaces by combining efficient LSM measurement and down-sampled fast AFM scan. The accuracy, resolution, spatial coverage and efficiency can all be significantly improved. It is thus expected to have potential applications in development of hybrid microscopy and in surface metrology.

  2. An Areal Isotropic Spline Filter for Surface Metrology.

    Science.gov (United States)

    Zhang, Hao; Tong, Mingsi; Chu, Wei

    2015-01-01

    This paper deals with the application of the spline filter as an areal filter for surface metrology. A profile (2D) filter is often applied in orthogonal directions to yield an areal filter for a three-dimensional (3D) measurement. Unlike the Gaussian filter, the spline filter presents an anisotropic characteristic when used as an areal filter. This disadvantage hampers the wide application of spline filters for evaluation and analysis of areal surface topography. An approximation method is proposed in this paper to overcome the problem. In this method, a profile high-order spline filter serial is constructed to approximate the filtering characteristic of the Gaussian filter. Then an areal filter with isotropic characteristic is composed by implementing the profile spline filter in the orthogonal directions. It is demonstrated that the constructed areal filter has two important features for surface metrology: an isotropic amplitude characteristic and no end effects. Some examples of applying this method on simulated and practical surfaces are analyzed.

  3. X-ray pulse wavefront metrology using speckle tracking.

    Science.gov (United States)

    Berujon, Sebastien; Ziegler, Eric; Cloetens, Peter

    2015-07-01

    An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology.

  4. Vortex metrology using Fourier analysis techniques: vortex networks correlation fringes.

    Science.gov (United States)

    Angel-Toro, Luciano; Sierra-Sosa, Daniel; Tebaldi, Myrian; Bolognini, Néstor

    2012-10-20

    In this work, we introduce an alternative method of analysis in vortex metrology based on the application of the Fourier optics techniques. The first part of the procedure is conducted as is usual in vortex metrology for uniform in-plane displacement determination. On the basis of two recorded intensity speckled distributions, corresponding to two states of a diffuser coherently illuminated, we numerically generate an analytical signal from each recorded intensity pattern by using a version of the Riesz integral transform. Then, from each analytical signal, a two-dimensional pseudophase map is generated in which the vortices are located and characterized in terms of their topological charges and their core's structural properties. The second part of the procedure allows obtaining Young's interference fringes when Fourier transforming the light passing through a diffracting mask with multiple apertures at the locations of the homologous vortices. In fact, we use the Fourier transform as a mathematical operation to compute the far-field diffraction intensity pattern corresponding to the multiaperture set. Each aperture from the set is associated with a rectangular hole that coincides both in shape and size with a pixel from recorded images. We show that the fringe analysis can be conducted as in speckle photography in an extended range of displacement measurements. Effects related with speckled decorrelation are also considered. Our experimental results agree with those of speckle photography in the range in which both techniques are applicable.

  5. Development of laser materials processing and laser metrology techniques

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Cheol Jung; Chung, Chin Man; Kim, Jeong Mook; Kim, Min Suk; Kim, Kwang Suk; Baik, Sung Hoon; Kim, Seong Ouk; Park, Seung Kyu

    1997-09-01

    The applications of remote laser materials processing and metrology have been investigated in nuclear industry from the beginning of laser invention because they can reduce the risks of workers in the hostile environment by remote operation. The objective of this project is the development of laser material processing and metrology techniques for repairing and inspection to improve the safety of nuclear power plants. As to repairing, we developed our own laser sleeve welding head and innovative optical laser weld monitoring techniques to control the sleeve welding process. Furthermore, we designedand fabricated a 800 W Nd:YAG and a 150 W Excimer laser systems for high power laser materials processing in nuclear industry such as cladding and decontamination. As to inspection, we developed an ESPI and a laser triangulation 3-D profile measurement system for defect detection which can complement ECT and UT inspections. We also developed a scanning laser vibrometer for remote vibration measurement of large structures and tested its performance. (author). 58 refs., 16 tabs., 137 figs.

  6. Metrology challenges for high-rate nanomanufacturing of polymer structures

    Science.gov (United States)

    Mead, Joey; Barry, Carol; Busnaina, Ahmed; Isaacs, Jacqueline

    2012-10-01

    The transfer of nanoscience accomplishments into commercial products is hindered by the lack of understanding of barriers to nanoscale manufacturing. We have developed a number of nanomanufacturing processes that leverage available high-rate plastics fabrication technologies. These processes include directed assembly of a variety of nanoelements, such as nanoparticles and nanotubes, which are then transferred onto a polymer substrate for the fabrication of conformal/flexible electronic materials, among other applications. These assembly processes utilize both electric fields and/or chemical functionalization. Conducting polymers and carbon nanotubes have been successfully transferred to a polymer substrate in times less than 5 minutes, which is commercially relevant and can be utilized in a continuous (reel to reel/roll to roll) process. Other processes include continuous high volume mixing of nanoelements (CNTs, etc) into polymers, multi-layer extrusion and 3D injection molding of polymer structures. These nanomanufacturing processes can be used for wide range of applications, including EMI shielding, flexible electronics, structural materials, and novel sensors (specifically for chem/bio detection). Current techniques to characterize the quality and efficacy of the processes are quite slow. Moreover, the instrumentation and metrology needs for these manufacturing processes are varied and challenging. Novel, rapid, in-line metrology to enable the commercialization of these processes is critically needed. This talk will explore the necessary measurement needs for polymer based nanomanufacturing processes for both step and continuous (reel to reel/roll to roll) processes.

  7. Influence of spatial temperature distribution on high accuracy interferometric metrology

    Science.gov (United States)

    Gu, Yongqiang; Miao, Erlong; Yan, Feng; Zhang, Jian; Yang, Huaijiang

    2010-10-01

    We calculate the influence of temperature change on the refractive index of air, establish a model of air temperature distribution and analyze the effect of different temperature distribution on the high accuracy interferometric metrology. First, a revised Edlen formula is employed to acquire the relation between temperature and refractive index of air, followed by introducing the fixed temperature gradient distribution among the spatial grid within the optical cavity between the reference flat and the test flat of the Fizeau interferometer, accompanied by a temperature change random function within each grid. Finally, all the rays through the air layer with different incident angles are traced by Matlab program in order to obtain the final output position, angle and OPD for each ray. The influence of different temperature distribution and the length of the optical cavity in on the testing accuracy can be analyzed through the RMS value that results from repeatable rays tracing. As a result, the horizontal distribution (vertical to optical axis) has a large effect on the testing accuracy. Thus, to realize the high accuracy figure metrology, the horizontal distribution of temperature must be rigorously controlled as well as to shorten the length of the optical cavity to a large extent. The results from our simulation are of great significant for the accuracy analysis of interferometric testing and the research of manufacturing a interferometer.

  8. INDUSTRIAL PHOTOGRAMMETRY - ACCEPTED METROLOGY TOOL OR EXOTIC NICHE

    Directory of Open Access Journals (Sweden)

    W. Bösemann

    2016-06-01

    Full Text Available New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]. This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM’s. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

  9. Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

    Science.gov (United States)

    Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

    2004-05-01

    Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will

  10. Space Software

    Science.gov (United States)

    1990-01-01

    Xontech, Inc.'s software package, XonVu, simulates the missions of Voyager 1 at Jupiter and Saturn, Voyager 2 at Jupiter, Saturn, Uranus and Neptune, and Giotto in close encounter with Comet Halley. With the program, the user can generate scenes of the planets, moons, stars or Halley's nucleus and tail as seen by Giotto, all graphically reproduced with high accuracy in wireframe representation. Program can be used on a wide range of computers, including PCs. User friendly and interactive, with many options, XonVu can be used by a space novice or a professional astronomer. With a companion user's manual, it sells for $79.

  11. Software architecture

    CERN Document Server

    Vogel, Oliver; Chughtai, Arif

    2011-01-01

    As a software architect you work in a wide-ranging and dynamic environment. You have to understand the needs of your customer, design architectures that satisfy both functional and non-functional requirements, and lead development teams in implementing the architecture. And it is an environment that is constantly changing: trends such as cloud computing, service orientation, and model-driven procedures open up new architectural possibilities. This book will help you to develop a holistic architectural awareness and knowledge base that extends beyond concrete methods, techniques, and technologi

  12. Low-cost scheme for high-precision dual-wavelength laser metrology.

    Science.gov (United States)

    Kok, Yitping; Ireland, Michael J; Robertson, J Gordon; Tuthill, Peter G; Warrington, Benjamin A; Tango, William J

    2013-04-20

    A method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dual-wavelength metrology, which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measurement. Although the method may be applicable to a variety of circumstances, the specific application in which this metrology is essential is in an astrometric optical long baseline stellar interferometer dedicated to precise measurement of stellar positions. In our example application of this metrology to a narrow-angle astrometric interferometer, measurement of nanometer precision could be achieved without frequency-stabilized lasers, although the use of such lasers would extend the range of optical path length the metrology can accurately measure. Implementation of the method requires very little additional optics or electronics, thus minimizing the cost and effort of implementation. Furthermore, the optical path traversed by the metrology lasers is identical to that of the starlight or science beams, even down to using the same photodetectors, thereby minimizing the noncommon path between metrology and science channels.

  13. Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

    Science.gov (United States)

    Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

    2016-12-01

    The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

  14. Global Software Engineering: A Software Process Approach

    Science.gov (United States)

    Richardson, Ita; Casey, Valentine; Burton, John; McCaffery, Fergal

    Our research has shown that many companies are struggling with the successful implementation of global software engineering, due to temporal, cultural and geographical distance, which causes a range of factors to come into play. For example, cultural, project managementproject management and communication difficulties continually cause problems for software engineers and project managers. While the implementation of efficient software processes can be used to improve the quality of the software product, published software process models do not cater explicitly for the recent growth in global software engineering. Our thesis is that global software engineering factors should be included in software process models to ensure their continued usefulness in global organisations. Based on extensive global software engineering research, we have developed a software process, Global Teaming, which includes specific practices and sub-practices. The purpose is to ensure that requirements for successful global software engineering are stipulated so that organisations can ensure successful implementation of global software engineering.

  15. QInfer: Statistical inference software for quantum applications

    CERN Document Server

    Granade, Christopher; Hincks, Ian; Casagrande, Steven; Alexander, Thomas; Gross, Jonathan; Kononenko, Michal; Sanders, Yuval

    2016-01-01

    Characterizing quantum systems through experimental data is critical to applications as diverse as metrology and quantum computing. Analyzing this experimental data in a robust and reproducible manner is made challenging, however, by the lack of readily-available software for performing principled statistical analysis. We improve the robustness and reproducibility of characterization by introducing an open-source library, QInfer, to address this need. Our library makes it easy to analyze data from tomography, randomized benchmarking, and Hamiltonian learning experiments either in post-processing, or online as data is acquired. QInfer also provides functionality for predicting the performance of proposed experimental protocols from simulated runs. By delivering easy- to-use characterization tools based on principled statistical analysis, QInfer helps address many outstanding challenges facing quantum technology.

  16. Overlay mark optimization for thick-film resist overlay metrology

    Institute of Scientific and Technical Information of China (English)

    Zhu Liang; Li Jie; Zhou Congshu; Gu Yili; Yang Huayue

    2009-01-01

    For thick resist implant layers, such as a high voltage P well and a deep N well, systematic and uncorrectable overlay residues brought about by the tapered resist profiles were found. It was found that the tapered profile is closely related to the pattern density. Potential solutions of the manufacturing problem include hardening the film solidness or balancing the exposure density. In this paper, instead of focusing on the process change methodology,we intend to solve the issue of the overlay metrology error from the perspective of the overlay mark design. Based on the comparison of the overlay performances between the proposed overlay mark and the original design, it is shown that the optimized overlay mark target achieves better performance in terms of profiles, dynamic precision,tool induced shift (TIS), and residues. Furthermore, five types of overlay marks with dummy bars are studied, and a recommendation for the overlay marks is given.

  17. Milligram mass metrology using an electrostatic force balance

    Science.gov (United States)

    Shaw, Gordon A.; Stirling, Julian; Kramar, John A.; Moses, Alexander; Abbott, Patrick; Steiner, Richard; Koffman, Andrew; Pratt, Jon R.; Kubarych, Zeina J.

    2016-10-01

    Although mass is typically defined within the International System of Units (SI) at the kilogram level, the pending SI redefinition provides an opportunity to realize mass at any scale using electrical metrology. We propose the use of an electromechanical balance to realize mass at the milligram level using SI electrical units. An integrated concentric-cylinder vacuum gap capacitor allows us to leverage the highly precise references available for capacitance, voltage and length to generate an electrostatic reference force. Weighing experiments performed on 1 mg and 20 mg artifacts show the same or lower uncertainty than similar experiments performed by subdividing the kilogram. The measurement is currently limited by the stability of the materials that compose the mass artifacts and the changes in adsorbed layers on the artifact surfaces as they are transferred from vacuum to air.

  18. Surface Figure Metrology for CELT Primary Mirror Segments

    Energy Technology Data Exchange (ETDEWEB)

    Sommargren, G; Phillion, D; Seppala, L; Lerner, S

    2001-02-27

    The University of California and California Institute of Technology are currently studying the feasibility of building a 30-m segmented ground based optical telescope called the California Extremely Large Telescope (CELT). The early ideas for this telescope were first described by Nelson and Mast and more recently refined by Nelson. In parallel, concepts for the fabrication of the primary segments were proposed by Mast, Nelson and Sommargren where high risk technologies were identified. One of these was the surface figure metrology needed for fabricating the aspheric mirror segments. This report addresses the advanced interferometry that will be needed to achieve 15nm rms accuracy for mirror segments with aspheric departures as large as 35mm peak-to-valley. For reasons of cost, size, measurement consistency and ease of operation we believe it is desirable to have a single interferometer that can be universally applied to each and every mirror segment. Such an instrument is described in this report.

  19. Gaussian quantum metrology and space-time probes

    CERN Document Server

    Šafránek, Dominik

    2016-01-01

    In this thesis we focus on Gaussian quantum metrology in the phase-space formalism and its applications in quantum sensing and the estimation of space-time parameters. We derive new formulae for the optimal estimation of multiple parameters encoded into Gaussian states. We discuss the discontinuous behavior of the figure of merit - the quantum Fisher information. Using derived expressions we devise a practical method of finding optimal probe states for the estimation of Gaussian channels and we illustrate this method on several examples. We show that the temperature of a probe state affects the estimation generically and always appears in the form of four multiplicative factors. We also discuss how well squeezed thermal states perform in the estimation of space-time parameters. Finally we study how the estimation precision changes when two parties exchanging a quantum state with the encoded parameter do not share a reference frame. We show that using a quantum reference frame could counter this effect.

  20. The At-Wavelength Metrology Facility at BESSY-II

    Directory of Open Access Journals (Sweden)

    Franz Schäfers

    2016-02-01

    Full Text Available The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.

  1. Digital holographic metrology based on multi-angle interferometry.

    Science.gov (United States)

    Dong, Jun; Jiang, Chao; Jia, Shuhai

    2016-09-15

    We propose a multi-angle interferometry method for digital holographic metrology. In an application of three-dimensional (3D) reconstruction, the hologram corresponding to a different illumination angle is recorded as the illumination angle with a single wavelength tilted at regular intervals by an electronically controlled rotating stage. A Fourier-transform-based axial depth scanning algorithm formed by the reconstructed phase is used to obtain the height point by point over the whole field of view. Hence, the 3D reconstruction can be obtained effectively; even the object has large depth discontinuities resulting from the difficulty of the phase unwrapping. Due to a monochrome source only being used, the method is available for objects with wavelength-dependent reflectivity and those that are free of chromatic aberration caused by the different wavelengths.

  2. Quantum metrology with spin cat states under dissipation.

    Science.gov (United States)

    Huang, Jiahao; Qin, Xizhou; Zhong, Honghua; Ke, Yongguan; Lee, Chaohong

    2015-12-09

    Quantum metrology aims to yield higher measurement precisions via quantum techniques such as entanglement. It is of great importance for both fundamental sciences and practical technologies, from testing equivalence principle to designing high-precision atomic clocks. However, due to environment effects, highly entangled states become fragile and the achieved precisions may even be worse than the standard quantum limit (SQL). Here we present a high-precision measurement scheme via spin cat states (a kind of non-Gaussian entangled states in superposition of two quasi-orthogonal spin coherent states) under dissipation. In comparison to maximally entangled states, spin cat states with modest entanglement are more robust against losses and their achievable precisions may still beat the SQL. Even if the detector is imperfect, the achieved precisions of the parity measurement are higher than the ones of the population measurement. Our scheme provides a realizable way to achieve high-precision measurements via dissipative quantum systems of Bose atoms.

  3. Integrated metrology: an enabler for advanced process control (APC)

    Science.gov (United States)

    Schneider, Claus; Pfitzner, Lothar; Ryssel, Heiner

    2001-04-01

    Advanced process control (APC) techniques become more and more important as short innovation cycles in microelectronics and a highly competitive market requires cost-effective solutions in semiconductor manufacturing. APC marks a paradigm shift from statistically based techniques (SPC) using monitor wafers for sampling measurement data towards product wafer control. The APC functionalities including run-to-run control, fault detection, and fault analysis allow to detect process drifts and excursions at an early stage and to minimize the number of misprocessed wafers. APC is being established as part of factory control systems through the definition of an APC framework. A precondition for APC is the availability of sensors and measurement methods providing the necessary wafer data. This paper discusses integrated metrology as an enabler for APC and demonstrates practical implementations in semiconductor manufacturing.

  4. Silver Nanoparticles: Technological Advances, Societal Impacts, and Metrological Challenges

    Science.gov (United States)

    Calderón-Jiménez, Bryan; Johnson, Monique E.; Montoro Bustos, Antonio R.; Murphy, Karen E.; Winchester, Michael R.; Vega Baudrit, José R.

    2017-01-01

    Silver nanoparticles (AgNPs) show different physical and chemical properties compared to their macroscale analogs. This is primarily due to their small size and, consequently, the exceptional surface area of these materials. Presently, advances in the synthesis, stabilization, and production of AgNPs have fostered a new generation of commercial products and intensified scientific investigation within the nanotechnology field. The use of AgNPs in commercial products is increasing and impacts on the environment and human health are largely unknown. This article discusses advances in AgNP production and presents an overview of the commercial, societal, and environmental impacts of this emerging nanoparticle (NP), and nanomaterials in general. Finally, we examine the challenges associated with AgNP characterization, discuss the importance of the development of NP reference materials (RMs) and explore their role as a metrological mechanism to improve the quality and comparability of NP measurements.

  5. Design, fabrication and metrological evaluation of wearable pressure sensors.

    Science.gov (United States)

    Goy, C B; Menichetti, V; Yanicelli, L M; Lucero, J B; López, M A Gómez; Parodi, N F; Herrera, M C

    2015-04-01

    Pressure sensors are valuable transducers that are necessary in a huge number of medical application. However, the state of the art of compact and lightweight pressure sensors with the capability of measuring the contact pressure between two surfaces (contact pressure sensors) is very poor. In this work, several types of wearable contact pressure sensors are fabricated using different conductive textile materials and piezo-resistive films. The fabricated sensors differ in size, the textile conductor used and/or the number of layers of the sandwiched piezo-resistive film. The intention is to study, through the obtaining of their calibration curves, their metrological properties (repeatability, sensitivity and range) and determine which physical characteristics improve their ability for measuring contact pressures. It has been found that it is possible to obtain wearable contact pressure sensors through the proposed fabrication process with satisfactory repeatability, range and sensitivity; and that some of these properties can be improved by the physical characteristics of the sensors.

  6. Round Robin for Optical Fiber Bragg Grating Metrology.

    Science.gov (United States)

    Rose, A H; Wang, C M; Dyer, S D

    2000-01-01

    NIST has administered the first round robin of measurements for optical fiber Bragg gratings. We compared the measurement of center wavelength, bandwidth, isolation, minimum relative transmittance, and relative group delay among several grating types in two industry groups, telecommunications and sensors. We found that the state of fiber Bragg grating metrology needs improvement in most areas. Specifically, when tunable lasers are used a filter is needed to remove broadband emissions from the laser. The linear slope of relative group delay measurements is sensitive to drift and systematic bias in the rf-modulation technique. The center wavelength measurement had a range of about 27 pm in the sensors group and is not adequate to support long-term structural monitoring applications.

  7. A search algorithm for quantum state engineering and metrology

    Science.gov (United States)

    Knott, P. A.

    2016-07-01

    In this paper we present a search algorithm that finds useful optical quantum states which can be created with current technology. We apply the algorithm to the field of quantum metrology with the goal of finding states that can measure a phase shift to a high precision. Our algorithm efficiently produces a number of novel solutions: we find experimentally ready schemes to produce states that show significant improvements over the state-of-the-art, and can measure with a precision that beats the shot noise limit by over a factor of 4. Furthermore, these states demonstrate a robustness to moderate/high photon losses, and we present a conceptually simple measurement scheme that saturates the Cramér-Rao bound.

  8. An active reflector antenna using a laser angle metrology system

    Institute of Scientific and Technical Information of China (English)

    Yong Zhang; Jie Zhang; De-Hua Yang; Guo-Hua Zhou; Ai-Hua Li; Guo-Ping Li

    2012-01-01

    An active reflector is one of the key technologies for constructing large telescopes,especially for millimeter/sub-millimeter radio telescopes.This article introduces a new efficient laser angle metrology system for an active reflector antenna on large radio telescopes.Our experiments concentrate on developing an active reflector for improving the detection precisions and the maintenance of the surface shape in real time on the 65-meter prototype radio telescope constructed by Nanjing Institute of Astronomical Optics and Technology (NIAOT; http://65m.shao.cas.cn/).The test results indicate that the accuracy of the surface shape segmentation and maintenance has the dimensions of microns,and the time-response can be on the order of minutes.Our efforts proved to be workable for sub-millimeter radio telescopes.

  9. Joint estimation of phase and phase diffusion for quantum metrology

    CERN Document Server

    Vidrighin, Mihai D; Genoni, Marco G; Jin, Xian-Min; Kolthammer, W Steven; Kim, M S; Datta, Animesh; Barbieri, Marco; Walmsley, Ian A

    2014-01-01

    Phase estimation, at the heart of many quantum metrology and communication schemes, can be strongly affected by noise, whose amplitude may not be known, or might be subject to drift. Here, we investigate the joint estimation of a phase shift and the amplitude of phase diffusion, at the quantum limit. For several relevant instances, this multiparameter estimation problem can be effectively reshaped as a two-dimensional Hilbert space model, encompassing the description of an interferometer phase probed with relevant quantum states -- split single-photons, coherent states or N00N states. For these cases, we obtain a trade-off bound on the statistical variances for the joint estimation of phase and phase diffusion, as well as optimum measurement schemes. We use this bound to quantify the effectiveness of an actual experimental setup for joint parameter estimation for polarimetry. We conclude by discussing the form of the trade-off relations for more general states and measurements.

  10. Three-dimensional metrology inside a vacuum chamber

    Science.gov (United States)

    Costille, Anne; Beaumont, Florent; Prieto, Eric; Carle, Michael; Fabron, Christophe

    2016-07-01

    Several three dimensional coordinates systems are proposed by companies to provide accurate measurement of mechanical parts in a volume. None of them are designed to perform the metrology of a system in a vacuum chamber. In the frame of the test of NISP instrument from ESA Euclid mission, the question was raised to perform a three dimensional measurement of different parts during the thermal test of NISP instrument into ERIOS chamber done at Laboratoire d'Astrophysique de Marseille (LAM). One of the main objectives of the test campaign will be the measurement of the focus position of NISP image plane with respect to the EUCLID object plane to ensure a good focalisation of NISP instrument after integration on the payload. A Metrology Verification System (MVS) has been proposed. Its goal is to provide at operational temperature the measurement of references frames set on a EUCLID telescope simulator and NISP, the knowledge of the coordinates of the object point source provided by the telescope simulator and the measurement of the angle between the telescope simulator optical axis and NISP optical axis. The MVS concept is based on the use of a laser tracker, outside the vacuum chamber, that measures reflectors inside the vacuum chamber through a curved window. We will present preliminary results that show the possibility to perform this type of measurements and the accuracy reached in this configuration. An analysis of the contributors to the measurement error budget of the MVS is proposed, based on the current knowledge of the MVS performance and constraints during the TB/TV tests.

  11. 3D spectral imaging system for anterior chamber metrology

    Science.gov (United States)

    Anderson, Trevor; Segref, Armin; Frisken, Grant; Frisken, Steven

    2015-03-01

    Accurate metrology of the anterior chamber of the eye is useful for a number of diagnostic and clinical applications. In particular, accurate corneal topography and corneal thickness data is desirable for fitting contact lenses, screening for diseases and monitoring corneal changes. Anterior OCT systems can be used to measure anterior chamber surfaces, however accurate curvature measurements for single point scanning systems are known to be very sensitive to patient movement. To overcome this problem we have developed a parallel 3D spectral metrology system that captures simultaneous A-scans on a 2D lateral grid. This approach enables estimates of the elevation and curvature of anterior and posterior corneal surfaces that are robust to sample movement. Furthermore, multiple simultaneous surface measurements greatly improve the ability to register consecutive frames and enable aggregate measurements over a finer lateral grid. A key element of our approach has been to exploit standard low cost optical components including lenslet arrays and a 2D sensor to provide a path towards low cost implementation. We demonstrate first prototypes based on 6 Mpixel sensor using a 250 μm pitch lenslet array with 300 sample beams to achieve an RMS elevation accuracy of 1μm with 95 dB sensitivity and a 7.0 mm range. Initial tests on Porcine eyes, model eyes and calibration spheres demonstrate the validity of the concept. With the next iteration of designs we expect to be able to achieve over 1000 simultaneous A-scans in excess of 75 frames per second.

  12. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  13. Manufacturing and metrology for IR conformal windows and domes

    Science.gov (United States)

    Ferralli, Ian; Blalock, Todd; Brunelle, Matt; Lynch, Timothy; Myer, Brian; Medicus, Kate

    2017-05-01

    Freeform and conformal optics have the potential to dramatically improve optical systems by enabling systems with fewer optical components, reduced aberrations, and improved aerodynamic performance. These optical components differ from standard components in their surface shape, typically a non-symmetric equation based definition, and material properties. Traditional grinding and polishing tools are unable to handle these freeform shapes. Additionally, standard metrology tools cannot measure these surfaces. Desired substrates are typically hard ceramics, including poly-crystalline alumina or aluminum oxynitride. Notwithstanding the challenges that the hardness provides to manufacturing, these crystalline materials can be highly susceptible to grain decoration creating unacceptable scatter in optical systems. In this presentation, we will show progress towards addressing the unique challenges of manufacturing conformal windows and domes. Particular attention is given to our robotic polishing platform. This platform is based on an industrial robot adapted to accept a wide range of tooling and parts. The robot's flexibility has provided us an opportunity to address the unique challenges of conformal windows. Slurries and polishing active layers can easily be changed to adapt to varying materials and address grain decoration. We have the flexibility to change tool size and shape to address the varying sizes and shapes of conformal optics. In addition, the robotic platform can be a base for a deflectometry-based metrology tool to measure surface form error. This system, whose precision is independent of the robot's positioning accuracy, will allow us to measure optics in-situ saving time and reducing part risk. In conclusion, we will show examples of the conformal windows manufactured using our developed processes.

  14. Deep sub-wavelength metrology for advanced defect classification

    Science.gov (United States)

    van der Walle, P.; Kramer, E.; van der Donck, J. C. J.; Mulckhuyse, W.; Nijsten, L.; Bernal Arango, F. A.; de Jong, A.; van Zeijl, E.; Spruit, H. E. T.; van den Berg, J. H.; Nanda, G.; van Langen-Suurling, A. K.; Alkemade, P. F. A.; Pereira, S. F.; Maas, D. J.

    2017-06-01

    Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification. For defect detection, TNO has developed the Rapid Nano (RN3) particle scanner, which illuminates the sample from nine azimuth angles. The RN3 is capable of detecting 42 nm Latex Sphere Equivalent (LSE) particles on XXX-flat Silicon wafers. For each sample, the lower detection limit (LDL) can be verified by an analysis of the speckle signal, which originates from the surface roughness of the substrate. In detection-mode (RN3.1), the signal from all illumination angles is added. In review-mode (RN3.9), the signals from all nine arms are recorded individually and analyzed in order to retrieve additional information on the shape and size of deep sub-wavelength defects. This paper presents experimental and modelling results on the extraction of shape information from the RN3.9 multi-azimuth signal such as aspect ratio, skewness, and orientation of test defects. Both modeling and experimental work confirm that the RN3.9 signal contains detailed defect shape information. After review by RN3.9, defects are coarsely classified, yielding a purified Defect-of-Interest (DoI) list for further analysis on slower metrology tools, such as SEM, AFM or HIM, that provide more detailed review data and further classification. Purifying the DoI list via optical metrology with RN3.9 will make inspection time on slower review tools more efficient.

  15. SOFTWARE METRICS VALIDATION METHODOLOGIES IN SOFTWARE ENGINEERING

    Directory of Open Access Journals (Sweden)

    K.P. Srinivasan

    2014-12-01

    Full Text Available In the software measurement validations, assessing the validation of software metrics in software engineering is a very difficult task due to lack of theoretical methodology and empirical methodology [41, 44, 45]. During recent years, there have been a number of researchers addressing the issue of validating software metrics. At present, software metrics are validated theoretically using properties of measures. Further, software measurement plays an important role in understanding and controlling software development practices and products. The major requirement in software measurement is that the measures must represent accurately those attributes they purport to quantify and validation is critical to the success of software measurement. Normally, validation is a collection of analysis and testing activities across the full life cycle and complements the efforts of other quality engineering functions and validation is a critical task in any engineering project. Further, validation objective is to discover defects in a system and assess whether or not the system is useful and usable in operational situation. In the case of software engineering, validation is one of the software engineering disciplines that help build quality into software. The major objective of software validation process is to determine that the software performs its intended functions correctly and provides information about its quality and reliability. This paper discusses the validation methodology, techniques and different properties of measures that are used for software metrics validation. In most cases, theoretical and empirical validations are conducted for software metrics validations in software engineering [1-50].

  16. Sandia software guidelines: Software quality planning

    Energy Technology Data Exchange (ETDEWEB)

    1987-08-01

    This volume is one in a series of Sandia Software Guidelines intended for use in producing quality software within Sandia National Laboratories. In consonance with the IEEE Standard for Software Quality Assurance Plans, this volume identifies procedures to follow in producing a Software Quality Assurance Plan for an organization or a project, and provides an example project SQA plan. 2 figs., 4 tabs.

  17. Metrological management evaluation based on ISO10012: an empirical study in ISO-14001-certified Spanish companies

    Energy Technology Data Exchange (ETDEWEB)

    Beltran, Jaime; Rivas, Miguel [Andalusian Institute of Technology, C/Leonardo Da Vinci, 2, 41092 Sevilla (Spain); Munuzuri, Jesus [University of Seville, Av/Americo Vespucio, s/n. 41092 Sevilla (Spain); Gonzalez, Cristina [National University of Distance Education, C/Juan del Rosal, 2, 28040 Madrid (Spain)

    2010-01-15

    Environmental management systems based on the ISO 14001 standard rely strongly on metrological measurement and confirmation processes to certify the extent to which organizations monitor and improve their environmental behavior. Nevertheless, the literature lacks in studies that assess the influence of these metrological processes on the performance of environmental management in organizations, even now that the international standard ISO 10012 is already available to establish requisites and guidelines for the development of a metrological management system that is compatible with any other standardized management system. This work seeks to assess that influence through the development of an evaluation model for metrological management, which is then validated through an experimental analysis of the results obtained from the application of an audit process in 11 Spanish companies, all ISO-14001-certified and operating in different industrial sectors. (author)

  18. Coherent Laser Radar Metrology System for Large Scale Optical Systems Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

  19. INNOVATIVE NON-CONTACT METROLOGY SOLUTIONS FOR LARGE OPTICAL TELESCOPES Project

    Data.gov (United States)

    National Aeronautics and Space Administration — NASA has unique non-contact precision metrology requirements for dimensionally inspecting the global position and orientation of large and highly-polished...

  20. Electron counting capacitance standard and quantum metrology triangle experiments at PTB

    Science.gov (United States)

    Scherer, H.; Schurr, J.; Ahlers, F. J.

    2017-06-01

    This paper summarizes the final results of the electron counting capacitance standard experiment at the Physikalisch-Technische Bundesanstalt (PTB) achieved since the publication of a preliminary result in 2012. All systematic uncertainty contributions were experimentally quantified and are discussed. Frequency-dependent measurements on the 1 pF cryogenic capacitor were performed using a high-precision transformer-based capacitance bridge with a relative uncertainty of 0.03 µF F-1. The results revealed a crucial problem related to the capacitor, which hampered realizing the quantum metrology triangle with an accuracy corresponding to a combined total uncertainty of better than a few parts per million and eventually caused the discontinuation of the experiment at PTB. This paper provides a conclusion on the implications for future quantum metrology triangle experiments from the latest CODATA adjustment of fundamental constants, and summarizes perspectives and outlooks on future quantum metrology triangle experiments based on topical developments in small-current metrology.

  1. Integration of full-spectrum metrology and polishing for rapid production of large aspheres Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Integration of three proven, non-contact, optical metrology techniques with an emerging new polishing approach in a single machine will enable the rapid production...

  2. Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium

    Energy Technology Data Exchange (ETDEWEB)

    Arpaia, P., E-mail: pasquale.arpaia@unina.it [Department of Electrical Engineering and Information Technology, University of Napoli Federico II, Naples (Italy); Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Girone, M., E-mail: mario.girone@cern.ch [Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Department of Engineering, University of Sannio, Benevento (Italy); Liccardo, A., E-mail: annalisa.liccardo@unina.it [Department of Electrical Engineering and Information Technology, University of Napoli Federico II, Naples (Italy); Pezzetti, M., E-mail: marco.pezzetti@cern.ch [Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Piccinelli, F., E-mail: fabio.piccinelli@cern.ch [Department of Mechanical Engineering, University of Brescia, Brescia (Italy)

    2015-12-15

    The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sources most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.

  3. Report on non-destructive traceable measuring technologies for micro systems metrology

    DEFF Research Database (Denmark)

    Gasparin, Stefania; Tosello, Guido; Hansen, Hans Nørgaard

    2010-01-01

    The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field...

  4. Adjustment method for embedded metrology engine in an EM773 series microcontroller.

    Science.gov (United States)

    Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

    2015-09-01

    This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

  5. Coherent Laser Radar Metrology System for Large Scale Optical Systems Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

  6. Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium.

    Science.gov (United States)

    Arpaia, P; Girone, M; Liccardo, A; Pezzetti, M; Piccinelli, F

    2015-12-01

    The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sources most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.

  7. Software engineering architecture-driven software development

    CERN Document Server

    Schmidt, Richard F

    2013-01-01

    Software Engineering: Architecture-driven Software Development is the first comprehensive guide to the underlying skills embodied in the IEEE's Software Engineering Body of Knowledge (SWEBOK) standard. Standards expert Richard Schmidt explains the traditional software engineering practices recognized for developing projects for government or corporate systems. Software engineering education often lacks standardization, with many institutions focusing on implementation rather than design as it impacts product architecture. Many graduates join the workforce with incomplete skil

  8. Report on non-destructive traceable measuring technologies for micro systems metrology

    DEFF Research Database (Denmark)

    Gasparin, Stefania; Tosello, Guido; Hansen, Hans Nørgaard

    2010-01-01

    The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field......The present chapter introduces the state of the art of the available technologies for carrying out micro and nano dimensional measurements, a description of the available calibration standards and a prospection of the future needs in the metrology field...

  9. [Recommendations for metrological control of measuring equipments in the clinical laboratories].

    Science.gov (United States)

    Dumontet, M; Giroud, C; Vassault, A; Guitel, F; Perrin, A; Braconnier, F; Férard, G; Beaudeux, J-L

    2009-01-01

    The control of the measuring equipment (balances, mass standards, micropipettes, dilutors, volumetric glassware, thermometers...) is essential to obtain reliable analytical results. This control requires knowledge and use of the main standards, instructions for use, metrological verifications and confirmations as well as creation of checking and standardizing certificates ensuring metrological traceability. These items should help to control the quality of the analytical performances (fidelity and trueness in particular).

  10. Demonstration of Parallel Scanning Probe Microscope for high throughput metrology and inspection

    OpenAIRE

    Sadeghian Marnani, H.; Dekker, A.; Herfst, R.W.; Winters, J.; Eigenraam, A.B.C.; Rijnbeek, R.A.; Nulkes, N.

    2015-01-01

    With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D and the throughput. Due to the advantages of sub-nanometer resolution and the ability of true 3D scanning, scanning probe microscope (SPM) and specifically atomic force microscope (AFM) are considered as alternative technologies for CD-metrology, ...

  11. Software Metrics to Estimate Software Quality using Software Component Reusability

    Directory of Open Access Journals (Sweden)

    Prakriti Trivedi

    2012-03-01

    Full Text Available Today most of the applications developed using some existing libraries, codes, open sources etc. As a code is accessed in a program, it is represented as the software component. Such as in java beans and in .net ActiveX controls are the software components. These components are ready to use programming code or controls that excel the code development. A component based software system defines the concept of software reusability. While using these components the main question arise is whether to use such components is beneficial or not. In this proposed work we are trying to present the answer for the same question. In this work we are presenting a set of software matrix that will check the interconnection between the software component and the application. How strong this relation defines the software quality after using this software component. The overall metrics will return the final result in terms of the boundless of the component with application.

  12. Roles of chemical metrology in electronics industry and associated environment in Korea: a tutorial.

    Science.gov (United States)

    Kang, Namgoo; Kim, Kyung Joong; Kim, Jin Seog; Lee, Joung Hae

    2015-03-01

    Chemical metrology is gaining importance in electronics industry that manufactures semiconductors, electronic displays, and microelectronics. Extensive and growing needs from this industry have raised the significance of accurate measurements of the amount of substances and material properties. For the first time, this paper presents information on how chemical metrology is being applied to meet a variety of needs in the aspects of quality control of electronics products and environmental regulations closely associated with electronics industry. For a better understanding of the roles of the chemical metrology within electronics industry, the recent research activities and results in chemical metrology are presented using typical examples in Korea where electronic industry is leading a national economy. Particular attention is paid to the applications of chemical metrology for advancing emerging electronics technology developments. Such examples are a novel technique for the accurate quantification of gas composition at nano-liter levels within a MEMS package, the surface chemical analysis of a semiconductor device. Typical metrological tools are also presented for the development of certified reference materials for fluorinated greenhouse gases and proficiency testing schemes for heavy metals and chlorinated toxic gas in order to cope properly with environmental issues within electronics industry. In addition, a recent technique is presented for the accurate measurement of the destruction and removal efficiency of a typical greenhouse gas scrubber.

  13. X-ray optics metrology limited by random noise, instrumental drifts, and systematic errors

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V.; Anderson, Erik H.; Barber, Samuel K.; Cambie, Rossana; Celestre, Richard; Conley, Raymond; Goldberg, Kenneth A.; McKinney, Wayne R.; Morrison, Gregory; Takacs, Peter Z.; Voronov, Dmitriy L.; Yuan, Sheng; Padmore, Howard A.

    2010-07-09

    Continuous, large-scale efforts to improve and develop third- and forth-generation synchrotron radiation light sources for unprecedented high-brightness, low emittance, and coherent x-ray beams demand diffracting and reflecting x-ray optics suitable for micro- and nano-focusing, brightness preservation, and super high resolution. One of the major impediments for development of x-ray optics with the required beamline performance comes from the inadequate present level of optical and at-wavelength metrology and insufficient integration of the metrology into the fabrication process and into beamlines. Based on our experience at the ALS Optical Metrology Laboratory, we review the experimental methods and techniques that allow us to mitigate significant optical metrology problems related to random, systematic, and drift errors with super-high-quality x-ray optics. Measurement errors below 0.2 mu rad have become routine. We present recent results from the ALS of temperature stabilized nano-focusing optics and dedicated at-wavelength metrology. The international effort to develop a next generation Optical Slope Measuring System (OSMS) to address these problems is also discussed. Finally, we analyze the remaining obstacles to further improvement of beamline x-ray optics and dedicated metrology, and highlight the ways we see to overcome the problems.

  14. The software life cycle

    CERN Document Server

    Ince, Darrel

    1990-01-01

    The Software Life Cycle deals with the software lifecycle, that is, what exactly happens when software is developed. Topics covered include aspects of software engineering, structured techniques of software development, and software project management. The use of mathematics to design and develop computer systems is also discussed. This book is comprised of 20 chapters divided into four sections and begins with an overview of software engineering and software development, paying particular attention to the birth of software engineering and the introduction of formal methods of software develop

  15. Large batch dimensional metrology demonstrated in the example of a LIGA fabricated spring.

    Energy Technology Data Exchange (ETDEWEB)

    Aigeldinger, Georg; Skala, Dawn M.; Ceremuga, Joseph T.

    2004-04-01

    Deep x-ray lithography in combination with electroforming is capable of producing high precision metal parts in small lot series. This study deals with a high aspect ratio structure with overall dimensions on the order of 10 mm x 7 mm x 1.5 mm, with the smallest line width being 150 {micro}m. The lateral deviation from the design is to be kept to a minimum, preferably below 5 {micro}m. To ensure adequate quality control, a semi-automated metrology technique has been established to measure all parts. While the paper will give a brief overview of all involved techniques, it focuses on the method to measure the top and bottom of the parts and the top of geometries following the process. The instrument used is a View Engineering Voyager V6x12 microscope, which is fully programmable. The microscope allows direct measurement of geometries but also is capable of saving all captured data as point clouds. These point clouds play a central role when evaluating part geometry. After measuring the part, the point cloud is compared to the computer aided design (CAD) contour of the part, using a commercially available software package. The challenge of proper edge lighting on a nickel alloy part is evaluated by varying lighting conditions systematically. Results of two conditions are presented along with a set of optimized parameters. With the introduced set of tools, process flow can be monitored by measuring geometries, e.g. linewidths in every step of the process line. An example for such analysis is given. After delivery of a large batch of parts, extensive numbers of datasets were available allowing the evaluation of the variation of part geometries. Discussed in detail is the deviation from part top to part bottom geometries indicating swelling of the PMMA mold in the electroplating bath.

  16. State preparation for quantum information science and metrology

    Energy Technology Data Exchange (ETDEWEB)

    Samblowski, Aiko

    2012-06-08

    The precise preparation of non-classical states of light is a basic requirement for performing quantum information tasks and quantum metrology. Depending on the assignment, the range of required states varies from preparing and modifying squeezed states to generating bipartite entanglement and establishing multimode entanglement networks. Every state needs special preparation techniques and hence it is important to develop the experimental expertise to generate all states with the desired degree of accuracy. In this thesis, the experimental preparation of different kinds of non-classical states of light is demonstrated. Starting with a multimode entangled state, the preparation of an unconditionally generated bound entangled state of light of unprecedented accuracy is shown. Its existence is of fundamental interest, since it certifies an intrinsic irreversibility of entanglement and suggests a connection with thermodynamics. The state is created in a network of linear optics, utilizing optical parametric amplifiers, operated below threshold, beam splitters and phase gates. The experimental platform developed here afforded the precise and stable control of all experimental parameters. Focusing on the aspect of quantum information networks, the generation of suitable bipartite entangled states of light is desirable. The optical connection between atomic transitions and light that can be transmitted via telecommunications fibers opens the possibility to employ quantum memories within fiber networks. For this purpose, a non-degenerate optical parametric oscillator is operated above threshold and the generation of bright bipartite entanglement between its twin beams at the wavelengths of 810 nm and 1550 nm is demonstrated. In the field of metrology, quantum states are used to enhance the measurement precision of interferometric gravitational wave (GW) detectors. Recently, the sensitivity of a GW detector operated at a wavelength of 1064 nm was increased using squeezed

  17. Entanglement and Metrology with Singlet-Triplet Qubits

    Science.gov (United States)

    Shulman, Michael Dean

    Electron spins confined in semiconductor quantum dots are emerging as a promising system to study quantum information science and to perform sensitive metrology. Their weak interaction with the environment leads to long coherence times and robust storage for quantum information, and the intrinsic tunability of semiconductors allows for controllable operations, initialization, and readout of their quantum state. These spin qubits are also promising candidates for the building block for a scalable quantum information processor due to their prospects for scalability and miniaturization. However, several obstacles limit the performance of quantum information experiments in these systems. For example, the weak coupling to the environment makes inter-qubit operations challenging, and a fluctuating nuclear magnetic field limits the performance of single-qubit operations. The focus of this thesis will be several experiments which address some of the outstanding problems in semiconductor spin qubits, in particular, singlet-triplet (S-T0) qubits. We use these qubits to probe both the electric field and magnetic field noise that limit the performance of these qubits. The magnetic noise bath is probed with high bandwidth and precision using novel techniques borrowed from the field of Hamiltonian learning, which are effective due to the rapid control and readout available in S-T 0 qubits. These findings allow us to effectively undo the undesired effects of the fluctuating nuclear magnetic field by tracking them in real-time, and we demonstrate a 30-fold improvement in the coherence time T2*. We probe the voltage noise environment of the qubit using coherent qubit oscillations, which is partially enabled by control of the nuclear magnetic field. We find that the voltage noise bath is frequency-dependent, even at frequencies as high as 1MHz, and it shows surprising and, as of yet, unexplained temperature dependence. We leverage this knowledge of the voltage noise environment, the

  18. Real cell overlay measurement through design based metrology

    Science.gov (United States)

    Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Jo, Gyoyeon; Yang, Hyunjo; Yim, Donggyu; Yamamoto, Masahiro; Maruyama, Kotaro; Park, Byungjun

    2014-04-01

    Until recent device nodes, lithography has been struggling to improve its resolution limit. Even though next generation lithography technology is now facing various difficulties, several innovative resolution enhancement technologies, based on 193nm wavelength, were introduced and implemented to keep the trend of device scaling. Scanner makers keep developing state-of-the-art exposure system which guarantees higher productivity and meets a more aggressive overlay specification. "The scaling reduction of the overlay error has been a simple matter of the capability of exposure tools. However, it is clear that the scanner contributions may no longer be the majority component in total overlay performance. The ability to control correctable overlay components is paramount to achieve the desired performance.(2)" In a manufacturing fab, the overlay error, determined by a conventional overlay measurement: by using an overlay mark based on IBO and DBO, often does not represent the physical placement error in the cell area of a memory device. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion, caused by etching or CMP, also can be a source of the mismatch. Therefore, the requirement of a direct overlay measurement in the cell pattern gradually increases in the manufacturing field, and also in the development level. In order to overcome the mismatch between conventional overlay measurement and the real placement error of layer to layer in the cell area of a memory device, we suggest an alternative overlay measurement method utilizing by design, based metrology tool. A basic concept of this method is shown in figure1. A CD-SEM measurement of the overlay error between layer 1 and 2 could be the ideal method but it takes too long time to extract a lot of data from wafer level. An E-beam based DBM tool provides high speed to cover the whole wafer with high repeatability. It is enabled by using the design as a

  19. Metrology Camera System Using Two-Color Interferometry

    Science.gov (United States)

    Dubovitsky, Serge; Liebe, Carl Christian; Peters, Robert; Lay, Oliver

    2007-01-01

    A metrology system that contains no moving parts simultaneously measures the bearings and ranges of multiple reflective targets in its vicinity, enabling determination of the three-dimensional (3D) positions of the targets with submillimeter accuracy. The system combines a direction-measuring metrology camera and an interferometric range-finding subsystem. Because the system is based partly on a prior instrument denoted the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor and because of its 3D capability, the system is denoted the MSTAR3D. Developed for use in measuring the shape (for the purpose of compensating for distortion) of large structures like radar antennas, it can also be used to measure positions of multiple targets in the course of conventional terrestrial surveying. A diagram of the system is shown in the figure. One of the targets is a reference target having a known, constant distance with respect to the system. The system comprises a laser for generating local and target beams at a carrier frequency; a frequency shifting unit to introduce a frequency shift offset between the target and local beams; a pair of high-speed modulators that apply modulation to the carrier frequency in the local and target beams to produce a series of modulation sidebands, the highspeed modulators having modulation frequencies of FL and FM; a target beam launcher that illuminates the targets with the target beam; optics and a multipixel photodetector; a local beam launcher that launches the local beam towards the multi-pixel photodetector; a mirror for projecting to the optics a portion of the target beam reflected from the targets, the optics being configured to focus the portion of the target beam at the multi-pixel photodetector; and a signal-processing unit connected to the photodetector. The portion of the target beam reflected from the targets produces spots on the multi-pixel photodetector corresponding to the targets, respectively, and the signal

  20. Amalgamation of Personal Software Process in Software ...

    African Journals Online (AJOL)

    evolutionary series of personal software engineering techniques that an engineer learns and ... Article History: Received : 30-04- ... began to realize that software process, plans and methodologies for ..... Executive Strategy. Addison-Wesley ...

  1. Image-based metrology of porous tissue engineering scaffolds

    Science.gov (United States)

    Rajagopalan, Srinivasan; Robb, Richard A.

    2006-03-01

    Tissue engineering is an interdisciplinary effort aimed at the repair and regeneration of biological tissues through the application and control of cells, porous scaffolds and growth factors. The regeneration of specific tissues guided by tissue analogous substrates is dependent on diverse scaffold architectural indices that can be derived quantitatively from the microCT and microMR images of the scaffolds. However, the randomness of pore-solid distributions in conventional stochastic scaffolds presents unique computational challenges. As a result, image-based characterization of scaffolds has been predominantly qualitative. In this paper, we discuss quantitative image-based techniques that can be used to compute the metrological indices of porous tissue engineering scaffolds. While bulk averaged quantities such as porosity and surface are derived directly from the optimal pore-solid delineations, the spatially distributed geometric indices are derived from the medial axis representations of the pore network. The computational framework proposed (to the best of our knowledge for the first time in tissue engineering) in this paper might have profound implications towards unraveling the symbiotic structure-function relationship of porous tissue engineering scaffolds.

  2. A practical evaluation of sequential estimation for vision metrology

    Science.gov (United States)

    Edmundson, Kenneth; Fraser, Clive S.

    Parameter estimation in photogrammetry is generally accomplished by means of a simultaneous least-squares adjustment in which all observational data must be at hand prior to solution. It follows that, despite the rapid turnaround provided by digital imagery and current measurement technology, the simultaneous adjustment cannot offer an indication of quality until acquisition and measurement are complete. On-line quality control of single-sensor vision metrology (VM) can be implemented effectively through on-line triangulation (OLT) with sequential estimation. In combination with established network design principles, sequential estimation can have a significant positive influence on economy and productivity in the industrial environment. While enhancing the efficiency of the triangulation procedure, the risks of collecting either insufficient or surplus imagery are also diminished. Furthermore, localised weaknesses within the overall network can be isolated and corrected. Sequential estimation is applicable to a variety of VM tasks. Here, in addition to quality control for single-sensor VM, the calibration of real-time, multi-sensor systems is addressed. This paper presents an overview of sequential estimation for VM consisting of a description of the general sequential problem followed by the necessary mathematical derivations. Significant implementational aspects are discussed and evaluations of practical testing are given. Promising experimental results clearly demonstrate that OLT can be an effective and valuable tool in industrial VM.

  3. Robust overlay metrology with differential Mueller matrix calculus.

    Science.gov (United States)

    Chen, Xiuguo; Gu, Honggang; Jiang, Hao; Zhang, Chuanwei; Liu, Shiyuan

    2017-04-17

    Overlay control is of vital importance to good device performances in semiconductor manufacturing. In this work, the differential Mueller matrix calculus is introduced to investigate the Mueller matrices of double-patterned gratings with overlay displacements, which helps to reveal six elementary optical properties hidden in the Mueller matrices. We find and demonstrate that, among these six elementary optical properties, the linear birefringence and dichroism, LB' and LD', along the ± 45° axes show a linear response to the overlay displacement and are zero when the overlay displacement is absent at any conical mounting. Although the elements from the two 2 × 2 off-diagonal blocks of the Mueller matrix have a similar property to LB' and LD', as reported in the literature, we demonstrate that it is only valid at a special conical mounting with the plane of incidence parallel to grating lines. The better property of LB' and LD' than the Mueller matrix elements of the off-diagonal blocks in the presence of overlay displacement verifies them to be a more robust indicator for the diffraction-based overlay metrology.

  4. Optical metrology in the conflict between desire and reality

    Science.gov (United States)

    Osten, W.

    2016-08-01

    In the context of measurement technology, optical methods have a number of unique features. On the other hand the user is faced with serious challenges. One of the biggest challenges that currently attracts high attention in both the technical as well as life sciences, relates to exceeding the physical limits of resolution. Nowadays people prefer to talk about super-resolution. However, this concept creates an often excessive expectation, since this way only the diffraction limit can be achieved in many practical cases. Not to forget are those negative consequences that arise from the high information density in optical signals. The nature of light and its fascinating interaction with matter that makes our visual sense on the one hand the most valuable information carrier, often prevents on the other hand, the metrologically correct interpretation of the results. Nevertheless, it can be proven by numerous examples that no alternative to the optical principles exists. Because critical structures are getting smaller and functional surfaces are becoming increasingly complex, the wavelength of light provides the most flexible and traceable standard to cope with the challenges. But the potential of optical methods, often seduced to an overload of the wish list or to unrealistic promises. Therefore, this paper is dedicated to the tension between desire and reality in optical measuring techniques.

  5. METROLOGICAL PERFORMANCES OF BOMB CALORIMETERS AT REAL CONDITIONS

    Directory of Open Access Journals (Sweden)

    Yu. V. Maksimuk

    2016-01-01

    Full Text Available The high-usage measurement equipment for heat of combustion of organic fuels are bomb isoperibol calorimeters with a water thermostat. The stability of work of calorimeters at real conditions is important for maintenance of reliability of measurement results. The article purpose – the analysis of stability for parameters of calorimeters to environment changes. In this work influence room temperature (Тк and heat exchange conditions on metrological characteristics of two models of calorimeters is considered with different degree of thermal protection: V-08МА and BIC 100. For calorimeters V-08МА the increase in a effective heat capacity (W on 0,1 % by growth of Tк on everyone 5 °С is established. To use value W in all interval laboratory temperatures Tк = 14–28 °С it is necessary to correct W on 2,8 J/°C on everyone 1 °С changes of Tк. Updating W is required, if the correction exceeds error in determination W. For calorimeter BIC 100 it is not revealed dependences W from Tк. BIC 100 have constant-temperature cap, high stability a temperature in thermostat and stabilized heat exchange. It is established that an standard deviation of cooling constant for all calorimeters in direct proportional to standard deviation W. 

  6. Preparation of alpha sources using magnetohydrodynamic electrodeposition for radionuclide metrology.

    Science.gov (United States)

    Panta, Yogendra M; Farmer, Dennis E; Johnson, Paula; Cheney, Marcos A; Qian, Shizhi

    2010-02-01

    Expanded use of nuclear fuel as an energy resource and terrorist threats to public safety clearly require the development of new state-of-the-art technologies and improvement of safety measures to minimize the exposure of people to radiation and the accidental release of radiation into the environment. The precision in radionuclide metrology is currently limited by the source quality rather than the detector performance. Electrodeposition is a commonly used technique to prepare massless radioactive sources. Unfortunately, the radioactive sources prepared by the conventional electrodeposition method produce poor resolution in alpha spectrometric measurements. Preparing radioactive sources with better resolution and higher yield in the alpha spectrometric range by integrating magnetohydrodynamic convection with the conventional electrodeposition technique was proposed and tested by preparing mixed alpha sources containing uranium isotopes ((238)U, (234)U), plutonium ((239)Pu), and americium ((241)Am) for alpha spectrometric determination. The effects of various parameters such as magnetic flux density, deposition current and time, and pH of the sample solution on the formed massless radioactive sources were also experimentally investigated.

  7. Assembly & Metrology of First Wall Components of SST-1

    Science.gov (United States)

    Parekh, Tejas; Santra, Prosenjit; Biswas, Prabal; Patel, Hiteshkumar; Paravastu, Yuvakiran; Jaiswal, Snehal; Chauhan, Pradeep; Babu, Gattu Ramesh; A, Arun Prakash; Bhavsar, Dhaval; Raval, Dilip C.; Khan, Ziauddin; Pradhan, Subrata

    2017-04-01

    First Wall Components (FWC) of SST-1 tokamak, which are in the immediate vicinity of plasma comprises of limiters, divertors, baffles, passive stabilizers are designed to operate long duration (1000 s) discharges of elongated plasma. All FWC consists of a copper alloy heat sink modules with SS cooling tubes brazed onto it, graphite tiles acting as armour material facing the plasma, and are mounted to the vacuum vessels with suitable Inconel support structures at ring & port locations. The FWC are very recently assembled and commissioned successfully inside the vacuum vessel of SST-1 undergoing a meticulous planning of assembly sequence, quality checks at every stage of the assembly process. This paper will present the metrology aspects & procedure of each FWC, both outside the vacuum vessel, and inside the vessel, assembly tolerances, tools, equipment and jig/fixtures, used at each stage of assembly, starting from location of support bases on vessel rings, fixing of copper modules on support structures, around 3800 graphite tile mounting on 136 copper modules with proper tightening torques, till final toroidal and poloidal geometry of the in-vessel components are obtained within acceptable limits, also ensuring electrical continuity of passive stabilizers to form a closed saddle loop, electrical isolation of passive stabilizers from vacuum vessel.

  8. A compact high-sensitivity heterodyne interferometer for industrial metrology

    Science.gov (United States)

    Schuldt, Thilo; Gohlke, Martin; Weise, Dennis; Peters, Achim; Johann, Ulrich; Braxmaier, Claus

    2008-04-01

    For translation and tilt metrology, we developed a compact fiber-coupled polarizing heterodyne interferometer which is based on a highly symmetric design where both, measurement and reference beam have similar optical pathlengths and the same frequency and polarization. The method of differential wavefront sensing is implemented for tilt measurement. With this setup we reached noise levels below 5 pm/square root of Hz; Hz in translation and below 10 nrad/square root of Hz; in tilt measurement, both for frequencies above 10-2 Hz. While this setup is developed with respect to the requirements of the LISA (Laser Interferometer Space Antenna) space mission, we here present the current status of its adoption to industrial applications. We currently design a very compact and quasi-monolithic setup of the interferometer sensor head based on ultra-low expansion glass material. The resulting compact and robust sensor head can be used for nano-positioning control. We also plan to implement a scan of the measurement beam over the surface under investigation enabling high resolution 3D profilometry and surface property measurements (i. e. roughness, evenness and roundness). The dedicated low-noise (piezo-electric actuator in the measurement beam of the interferometer will be realized using integrated micro-system technology and can either be implemented in one or two dimensions.

  9. Laser metrology for coherent multi-telescope arrays

    Science.gov (United States)

    Shao, Michael; Massie, Norbert A.

    1993-01-01

    In multi-telescope arrays that comprise multiple telescopes, a beam-combining module, and flat mirrors for directing light beams from the multiple telescopes to the beam combining module, a laser metrology system is used for monitoring various pathlengths along a beam path where deviations are likely. Some pathlengths are defined simply by a pair of retroreflectors or reflectors at both ends. Lengths between pairs of retroreflectors are measured and monitored by laser interferometers. One critical pathlength deviation is related to the displacement of the flat mirror. A reference frame is set up relative to the beam-combining module to form and define the coordinate system within which the positions of the flat mirrors are measured and monitored. In the preferred embodiment, a pair of retroreflectors along the optical axis of the beam-combining module defines a reference frame. A triangle is formed by the reference frame as the base and another retroreflector at the flat mirror as the vertex. The triangle is used to monitor the position of the flat mirror. A beam's pathlength is dynamically corrected in response to the monitored deviations.

  10. Metrology of white light interferometer for TSV processing

    Science.gov (United States)

    Timoney, Padraig; Ko, Yeong-Uk; Fisher, Daniel; Lu, Cheng Kuan; Ramnath, Yudesh; Vaid, Alok; Thangaraju, Sarasvathi; Smith, Daniel; Kamineni, Himani; Zhang, Dingyou; Kim, Wonwoo; Alapati, Ramakanth; Peak, Jonathan; Amin, Hemant; Edmunson, Holly; Race, Joe; Peterson, Brennan; Johnson, Tim

    2014-04-01

    3D integration technology offers an alternative to traditional packaging designs. In traditional Moore's law scaling, features are added to the die, with graphics, memory control and logic coprocessors all integrated onto the silicon chip. TSV (through silicon via) processing utilizes vertical electrical interconnects that provide the shortest possible path to establish an electrical connection from the device side to the backside of a die. This indirectly allows continues "Moore"- like scaling while only affecting the device packaging. White light interferometry (WLI) has been used for the measurement of topography, step height and via depth using its short coherence length. The nanometer level resolution of this technique is ideal for TSV measurements in the high aspect ratio vias. In this work, six white light interferometer measurements for TSV processing are discussed along with the importance of these measurements to TSV processing, namely: 1. Post-TSV etch: depth, top CD (TCD) and bottom CD (BCD) 2. Post-TSV liner BCD 3. Post-TSV barrier seed BCD 4. TSV electro-chemically plated (ECP) copper bump step height 5. Post-annealing bump step height 6. TSV CMP dishing These measurement steps have been implemented in-line for advanced technology node TSV process flows at GLOBALFOUNDRIES. The measurements demonstrate 90% correlation to reference metrology and <0.5% repeatability. Cross section SEM was used as a reference for TSV profile and Cu bump measurements while AFM was used as a reference for dishing measurements.

  11. Electromagnetic Nanoscale Metrology Based on Entropy Production and Fluctuations

    Directory of Open Access Journals (Sweden)

    James Baker-Jarvis

    2008-10-01

    Full Text Available The goal in this paper is to show how many high-frequency electromagnetic metrology areas can be understood and formulated in terms of entropy evolution, production, and fluctuations. This may be important in nanotechnology where an understanding of fluctuations of thermal and electromagnetic energy and the effects of nonequilibrium are particularly important. The approach used here is based on a new derivation of an entropy evolution equation using an exact Liouville-based statistical-mechanical theory rooted in the Robertson-Zwanzig-Mori formulations. The analysis begins by developing an exact equation for entropy rate in terms of time correlations of the microscopic entropy rate. This equation is an exact fluctuation-dissipation relationship. We then define the entropy and its production for electromagnetic driving, both in the time and frequency domains, and apply this to study dielectric and magnetic material measurements, magnetic relaxation, cavity resonance, noise, measuring Boltzmann’s constant, and power measurements.

  12. Metrology Camera System of Prime Focus Spectrograph for Subaru Telescope

    CERN Document Server

    Wang, Shiang-Yu; Huang, Pin-Jie; Ling, Hung-Hsu; Karr, Jennifer; Chang, Yin-Chang; Hu, Yen-Shan; Hsu, Shu-Fu; Chen, Hsin-Yo; Gunn, James E; Reiley, Dan J; Tamura, Naoyuki; Takato, Naruhisa; Shimono, Atsushi

    2016-01-01

    The Prime Focus Spectrograph (PFS) is a new optical/near-infrared multi-fiber spectrograph designed for the prime focus of the 8.2m Subaru telescope. PFS will cover a 1.3 degree diameter field with 2394 fibers to complement the imaging capabilities of Hyper SuprimeCam. To retain high throughput, the final positioning accuracy between the fibers and observing targets of PFS is required to be less than 10um. The metrology camera system (MCS) serves as the optical encoder of the fiber motors for the configuring of fibers. MCS provides the fiber positions within a 5um error over the 45 cm focal plane. The information from MCS will be fed into the fiber positioner control system for the closed loop control. MCS will be located at the Cassegrain focus of Subaru telescope in order to to cover the whole focal plane with one 50M pixel Canon CMOS camera. It is a 380mm Schmidt type telescope which generates a uniform spot size with a 10 micron FWHM across the field for reasonable sampling of PSF. Carbon fiber tubes are ...

  13. Nonlinear acoustics in ultrasound metrology and other selected applications

    Science.gov (United States)

    Lewin, Peter A.

    2010-01-01

    A succinct background explaining why, initially, both the scientific community and industry were skeptical about the existence of the nonlinear (NL) wave propagation in tissue will be given and the design of an adequately wideband piezoelectric polymer hydrophone probe that was eventually used to verify that the 1-5 MHz probing wave then used in diagnostic ultrasound imaging was undergoing nonlinear distortion and generated harmonics in tissue will be discussed. The far-reaching implications of the advent of the piezoelectric PVDF polymer material will be reviewed and the advances in ultrasound metrology prompted by the regulatory agencies such as US Food and Drug Administration (FDA) and International Electrotechnical Commission (IEC) will be presented. These advances include the development of absolute calibration techniques for hydrophones along with the methods of accounting for spatial averaging corrections up to 100 MHz and the development of 'point-receiver' hydrophone probes utilizing acousto-optic sensors. Next, selected therapeutic applications of nonlinear ultrasonics (NLU), including lithotripters will be briefly discussed. Also, the use of shock waves as pain relief tool and in abating penicillin resistant bacteria that develop rock hard 'biofilm' that can be shattered by the finite amplitude wave will also be mentioned. The growing applications of NLU in cosmetic industry where it is used for redistribution and reduction of fatty tissue within the body will be briefly reviewed, and, finally, selected examples of NLU applications in retail and entertainment industry will also be pointed out.

  14. Köhler illumination in high-resolution optical metrology

    Science.gov (United States)

    Sohn, Yeung Joon; Barnes, Brian M.; Howard, Lowell; Silver, Richard M.; Attota, Ravikiran; Stocker, Michael T.

    2006-03-01

    Accurate preparation of illumination is critical for high-resolution optical metrology applications such as linewidth and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler illumination into three components. The three Koehler illumination components are defined as full field spatial intensity variation (Koehler factor 1), angular intensity homogeneity (Koehler factor 2), and wavefront phase/intensity homogeneity (Koehler factor 3). We have also proposed a field aperture pattern transfer method to analyze the illumination properties with respect to systematic variations, such as the shape of the source, the intensity distribution at the back focal plane, and the displacements of elements along and off the optical axis. These factors were investigated in both ideal and practical illumination systems. In particular, any angular asymmetry in the illumination proves to have a detrimental effect upon the distribution of light that illuminates the target. Wavefront asymmetry is also studied in the context of an optical system with a coherent or partially coherent light source.

  15. Automated CD-SEM metrology for efficient TD and HVM

    Science.gov (United States)

    Starikov, Alexander; Mulapudi, Satya P.

    2008-03-01

    CD-SEM is the metrology tool of choice for patterning process development and production process control. We can make these applications more efficient by extracting more information from each CD-SEM image. This enables direct monitors of key process parameters, such as lithography dose and focus, or predicting the outcome of processing, such as etched dimensions or electrical parameters. Automating CD-SEM recipes at the early stages of process development can accelerate technology characterization, segmentation of variance and process improvements. This leverages the engineering effort, reduces development costs and helps to manage the risks inherent in new technology. Automating CD-SEM for manufacturing enables efficient operations. Novel SEM Alarm Time Indicator (SATI) makes this task manageable. SATI pulls together data mining, trend charting of the key recipe and Operations (OPS) indicators, Pareto of OPS losses and inputs for root cause analysis. This approach proved natural to our FAB personnel. After minimal initial training, we applied new methods in 65nm FLASH manufacture. This resulted in significant lasting improvements of CD-SEM recipe robustness, portability and automation, increased CD-SEM capacity and MT productivity.

  16. Absolute surface reconstruction by slope metrology and photogrammetry

    Science.gov (United States)

    Dong, Yue

    Developing the manufacture of aspheric and freeform optical elements requires an advanced metrology method which is capable of inspecting these elements with arbitrary freeform surfaces. In this dissertation, a new surface measurement scheme is investigated for such a purpose, which is to measure the absolute surface shape of an object under test through its surface slope information obtained by photogrammetric measurement. A laser beam propagating toward the object reflects on its surface while the vectors of the incident and reflected beams are evaluated from the four spots they leave on the two parallel transparent windows in front of the object. The spots' spatial coordinates are determined by photogrammetry. With the knowledge of the incident and reflected beam vectors, the local slope information of the object surface is obtained through vector calculus and finally yields the absolute object surface profile by a reconstruction algorithm. An experimental setup is designed and the proposed measuring principle is experimentally demonstrated by measuring the absolute surface shape of a spherical mirror. The measurement uncertainty is analyzed, and efforts for improvement are made accordingly. In particular, structured windows are designed and fabricated to generate uniform scattering spots left by the transmitted laser beams. Calibration of the fringe reflection instrument, another typical surface slope measurement method, is also reported in the dissertation. Finally, a method for uncertainty analysis of a photogrammetry measurement system by optical simulation is investigated.

  17. metrological performance improvement of a superconducting cable test station

    CERN Document Server

    Montenero, Giuseppe; Ballarino, Amalia

    The work presented in this PhD thesis concerns the metrological performance improvement of a superconducting cable test station based on superconducting transformers. The main cable’s parameter to be assessed –as a function of temperature and magnetic field– is the critical current, i.e. beyond this limit the phase transition to the normal state occurs. Ramping the current at levels in the order of the tens of kA can be achieved with superconducting transformers at moderate capital and operational cost. But, issues such as (i) accurate/precise measurements and (ii) monitoring of the secondary current during the device operation have to be addressed. In this regard, the goals of the thesis are the design, prototyping, and validation of a new cryogenic current transducer and effective monitoring system for test stations transformer-based. Among the available transducers for current sensing at room temperature, the DC current transformer (DCCT) provides measurement accuracy in the order of the hundreds of ...

  18. Software attribute visualization for high integrity software

    Energy Technology Data Exchange (ETDEWEB)

    Pollock, G.M.

    1998-03-01

    This report documents a prototype tool developed to investigate the use of visualization and virtual reality technologies for improving software surety confidence. The tool is utilized within the execution phase of the software life cycle. It provides a capability to monitor an executing program against prespecified requirements constraints provided in a program written in the requirements specification language SAGE. The resulting Software Attribute Visual Analysis Tool (SAVAnT) also provides a technique to assess the completeness of a software specification.

  19. Ontologies for software engineering and software technology

    CERN Document Server

    Calero, Coral; Piattini, Mario

    2006-01-01

    Covers two applications of ontologies in software engineering and software technology: sharing knowledge of the problem domain and using a common terminology among all stakeholders; and filtering the knowledge when defining models and metamodels. This book is of benefit to software engineering researchers in both academia and industry.

  20. Controlling Software Piracy.

    Science.gov (United States)

    King, Albert S.

    1992-01-01

    Explains what software manufacturers are doing to combat software piracy, recommends how managers should deal with this problem, and provides a role-playing exercise to help students understand the issues in software piracy. (SR)

  1. Space Flight Software Development Software for Intelligent System Health Management

    Science.gov (United States)

    Trevino, Luis C.; Crumbley, Tim

    2004-01-01

    The slide presentation examines the Marshall Space Flight Center Flight Software Branch, including software development projects, mission critical space flight software development, software technical insight, advanced software development technologies, and continuous improvement in the software development processes and methods.

  2. Software Engineering Guidebook

    Science.gov (United States)

    Connell, John; Wenneson, Greg

    1993-01-01

    The Software Engineering Guidebook describes SEPG (Software Engineering Process Group) supported processes and techniques for engineering quality software in NASA environments. Three process models are supported: structured, object-oriented, and evolutionary rapid-prototyping. The guidebook covers software life-cycles, engineering, assurance, and configuration management. The guidebook is written for managers and engineers who manage, develop, enhance, and/or maintain software under the Computer Software Services Contract.

  3. Software and systems traceability

    CERN Document Server

    Cleland-Huang, Jane; Zisman, Andrea

    2012-01-01

    ""Software and Systems Traceability"" provides a comprehensive description of the practices and theories of software traceability across all phases of the software development lifecycle. The term software traceability is derived from the concept of requirements traceability. Requirements traceability is the ability to track a requirement all the way from its origins to the downstream work products that implement that requirement in a software system. Software traceability is defined as the ability to relate the various types of software artefacts created during the development of software syst

  4. Software for evaluation of EPR-dosimetry performance.

    Science.gov (United States)

    Shishkina, E A; Timofeev, Yu S; Ivanov, D V

    2014-06-01

    Electron paramagnetic resonance (EPR) with tooth enamel is a method extensively used for retrospective external dosimetry. Different research groups apply different equipment, sample preparation procedures and spectrum processing algorithms for EPR dosimetry. A uniform algorithm for description and comparison of performances was designed and implemented in a new computer code. The aim of the paper is to introduce the new software 'EPR-dosimetry performance'. The computer code is a user-friendly tool for providing a full description of method-specific capabilities of EPR tooth dosimetry, from metrological characteristics to practical limitations in applications. The software designed for scientists and engineers has several applications, including support of method calibration by evaluation of calibration parameters, evaluation of critical value and detection limit for registration of radiation-induced signal amplitude, estimation of critical value and detection limit for dose evaluation, estimation of minimal detectable value for anthropogenic dose assessment and description of method uncertainty.

  5. A metrological approach to improve accuracy and reliability of ammonia measurements in ambient air

    Science.gov (United States)

    Pogány, Andrea; Balslev-Harder, David; Braban, Christine F.; Cassidy, Nathan; Ebert, Volker; Ferracci, Valerio; Hieta, Tuomas; Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Peltola, Jari; Persijn, Stefan; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

    2016-11-01

    The environmental impacts of ammonia (NH3) in ambient air have become more evident in the recent decades, leading to intensifying research in this field. A number of novel analytical techniques and monitoring instruments have been developed, and the quality and availability of reference gas mixtures used for the calibration of measuring instruments has also increased significantly. However, recent inter-comparison measurements show significant discrepancies, indicating that the majority of the newly developed devices and reference materials require further thorough validation. There is a clear need for more intensive metrological research focusing on quality assurance, intercomparability and validations. MetNH3 (Metrology for ammonia in ambient air) is a three-year project within the framework of the European Metrology Research Programme (EMRP), which aims to bring metrological traceability to ambient ammonia measurements in the 0.5-500 nmol mol-1 amount fraction range. This is addressed by working in three areas: (1) improving accuracy and stability of static and dynamic reference gas mixtures, (2) developing an optical transfer standard and (3) establishing the link between high-accuracy metrological standards and field measurements. In this article we describe the concept, aims and first results of the project.

  6. In-field Raman amplification on coherent optical fiber links for frequency metrology.

    Science.gov (United States)

    Clivati, C; Bolognini, G; Calonico, D; Faralli, S; Mura, A; Levi, F

    2015-04-20

    Distributed Raman amplification (DRA) is widely exploited for the transmission of broadband, modulated signals used in data links, but not yet in coherent optical links for frequency metrology, where the requirements are rather different. After preliminary tests on fiber spools, in this paper we deeper investigate Raman amplification on deployed in-field optical metrological links. We actually test a Doppler-stabilized optical link both on a 94 km-long metro-network implementation with multiplexed ITU data channels and on a 180 km-long dedicated fiber haul connecting two cities, where DRA is employed in combination with Erbium-doped fiber amplification (EDFA). The performance of DRA is detailed in both experiments, indicating that it does not introduce noticeable penalties for the metrological signal or for the ITU data channels. We hence show that Raman amplification of metrological signals can be compatible with a wavelength division multiplexing architecture and that it can be used as an alternative or in combination with dedicated bidirectional EDFAs. No deterioration is noticed in the coherence properties of the delivered signal, which attains frequency instability at the 10(-19) level in both cases. This study can be of interest also in view of the undergoing deployment of continental fiber networks for frequency metrology.

  7. Range-Gated Metrology: An Ultra-Compact Sensor for Dimensional Stabilization

    Science.gov (United States)

    Lay, Oliver P.; Dubovitsky, Serge; Shaddock, Daniel A.; Ware, Brent; Woodruff, Christopher S.

    2008-01-01

    Point-to-point laser metrology systems can be used to stabilize large structures at the nanometer levels required for precision optical systems. Existing sensors are large and intrusive, however, with optical heads that consist of several optical elements and require multiple optical fiber connections. The use of point-to-point laser metrology has therefore been limited to applications where only a few gauges are needed and there is sufficient space to accommodate them. Range-Gated Metrology is a signal processing technique that preserves nanometer-level or better performance while enabling: (1) a greatly simplified optical head - a single fiber optic collimator - that can be made very compact, and (2) a single optical fiber connection that is readily multiplexed. This combination of features means that it will be straightforward and cost-effective to embed tens or hundreds of compact metrology gauges to stabilize a large structure. In this paper we describe the concept behind Range-Gated Metrology, demonstrate the performance in a laboratory environment, and give examples of how such a sensor system might be deployed.

  8. Maximizing ROI on software development

    CERN Document Server

    Sikka, Vijay

    2004-01-01

    A brief review of software development history. Software complexity crisis. Software development ROI. The case for global software development and testing. Software quality and test ROI. How do you implement global software development and testing. Case studies.

  9. Using Vision Metrology System for Quality Control in Automotive Industries

    Science.gov (United States)

    Mostofi, N.; Samadzadegan, F.; Roohy, Sh.; Nozari, M.

    2012-07-01

    The need of more accurate measurements in different stages of industrial applications, such as designing, producing, installation, and etc., is the main reason of encouraging the industry deputy in using of industrial Photogrammetry (Vision Metrology System). With respect to the main advantages of Photogrammetric methods, such as greater economy, high level of automation, capability of noncontact measurement, more flexibility and high accuracy, a good competition occurred between this method and other industrial traditional methods. With respect to the industries that make objects using a main reference model without having any mathematical model of it, main problem of producers is the evaluation of the production line. This problem will be so complicated when both reference and product object just as a physical object is available and comparison of them will be possible with direct measurement. In such case, producers make fixtures fitting reference with limited accuracy. In practical reports sometimes available precision is not better than millimetres. We used a non-metric high resolution digital camera for this investigation and the case study that studied in this paper is a chassis of automobile. In this research, a stable photogrammetric network designed for measuring the industrial object (Both Reference and Product) and then by using the Bundle Adjustment and Self-Calibration methods, differences between the Reference and Product object achieved. These differences will be useful for the producer to improve the production work flow and bringing more accurate products. Results of this research, demonstrate the high potential of proposed method in industrial fields. Presented results prove high efficiency and reliability of this method using RMSE criteria. Achieved RMSE for this case study is smaller than 200 microns that shows the fact of high capability of implemented approach.

  10. Self-mixing interferometry: a novel yardstick for mechanical metrology

    Science.gov (United States)

    Donati, Silvano

    2016-11-01

    A novel configuration of interferometry, SMI (self-mixing interferometry), is described in this paper. SMI is attractive because it doesn't require any optical part external to the laser and can be employed in a variety of measurements - indeed it is sometimes indicated as the "interferometer for measuring without an interferometer". On processing the phase carried by the optical field upon propagation to the target under test, a number of applications have been developed, including traditional measurements related to metrology and mechanical engineering - like displacement, distance, small-amplitude vibrations, attitude angles, velocity, as well as new measurements, like mechanical stress-strain hysterisis and microstructure/MEMS electro-mechanical response. In another field, sensing of motility finds direct application in a variety of biophysical measurements, like blood pulsation, respiratory sounds, chest acoustical impedance, and blood velocity profile. And, we may also look at the amplitude of the returning signal in a SMI, and we can measure weak optical echoes - for return loss and isolation factor measurements, CD readout and scroll sensing, and THz-wave detection. Last, the fine details of the SMI waveform reveal physical parameters of the laser like the laser linewidth, coherence length, and alpha factor. Worth to be noted, SMI is also a coherent detection scheme, and measurement close to the quantum limit of received field with minimum detectable displacements of 100 pm/√Hz are currently achieved upon operation on diffusive targets, whereas in detection mode returning signal can be sensed down to attenuations of -80dB.

  11. Emerging metrology for high-throughput nanomaterial genotoxicology.

    Science.gov (United States)

    Nelson, Bryant C; Wright, Christa W; Ibuki, Yuko; Moreno-Villanueva, Maria; Karlsson, Hanna L; Hendriks, Giel; Sims, Christopher M; Singh, Neenu; Doak, Shareen H

    2017-01-01

    The rapid development of the engineered nanomaterial (ENM) manufacturing industry has accelerated the incorporation of ENMs into a wide variety of consumer products across the globe. Unintentionally or not, some of these ENMs may be introduced into the environment or come into contact with humans or other organisms resulting in unexpected biological effects. It is thus prudent to have rapid and robust analytical metrology in place that can be used to critically assess and/or predict the cytotoxicity, as well as the potential genotoxicity of these ENMs. Many of the traditional genotoxicity test methods [e.g. unscheduled DNA synthesis assay, bacterial reverse mutation (Ames) test, etc.,] for determining the DNA damaging potential of chemical and biological compounds are not suitable for the evaluation of ENMs, due to a variety of methodological issues ranging from potential assay interferences to problems centered on low sample throughput. Recently, a number of sensitive, high-throughput genotoxicity assays/platforms (CometChip assay, flow cytometry/micronucleus assay, flow cytometry/γ-H2AX assay, automated 'Fluorimetric Detection of Alkaline DNA Unwinding' (FADU) assay, ToxTracker reporter assay) have been developed, based on substantial modifications and enhancements of traditional genotoxicity assays. These new assays have been used for the rapid measurement of DNA damage (strand breaks), chromosomal damage (micronuclei) and for detecting upregulated DNA damage signalling pathways resulting from ENM exposures. In this critical review, we describe and discuss the fundamental measurement principles and measurement endpoints of these new assays, as well as the modes of operation, analytical metrics and potential interferences, as applicable to ENM exposures. An unbiased discussion of the major technical advantages and limitations of each assay for evaluating and predicting the genotoxic potential of ENMs is also provided. Published by Oxford University Press on

  12. REVIEW ARTICLE: Bayesian assessment of uncertainty in metrology: a tutorial

    Science.gov (United States)

    Lira, I.; Grientschnig, D.

    2010-06-01

    The publication of the Guide to the Expression of Uncertainty in Measurement (GUM), and later of its Supplement 1, can be considered to be landmarks in the field of metrology. The second of these documents recommends a general Monte Carlo method for numerically constructing the probability distribution of a measurand given the probability distributions of its input quantities. The output probability distribution can be used to estimate the fixed value of the measurand and to calculate the limits of an interval wherein that value is expected to be found with a given probability. The approach in Supplement 1 is not restricted to linear or linearized models (as is the GUM) but it is limited to a single measurand. In this paper the theory underlying Supplement 1 is re-examined with a view to covering explicit or implicit measurement models that may include any number of output quantities. It is shown that the main elements of the theory are Bayes' theorem, the principles of probability calculus and the rules for constructing prior probability distributions. The focus is on developing an analytical expression for the joint probability distribution of all quantities involved. In practice, most times this expression will have to be integrated numerically to obtain the distribution of the output quantities, but not necessarily by using the Monte Carlo method. It is stressed that all quantities are assumed to have unique values, so their probability distributions are to be interpreted as encoding states of knowledge that are (i) logically consistent with all available information and (ii) conditional on the correctness of the measurement model and on the validity of the statistical assumptions that are used to process the measurement data. A rigorous notation emphasizes this interpretation.

  13. Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

    Science.gov (United States)

    Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka

    2015-03-01

    Overlay metrology accuracy is a major concern for our industry. Advanced logic process require more tighter overlay control for multipatterning schemes. TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). Methods of compensation have been introduced, some are even very efficient to reduce these measured offsets. Another related question is about the overlay target designs. These targets are never fully representative of the design rules, strong efforts have been achieved, but the device cannot be completely duplicated. Ideally, we would like to measure in the device itself to verify the real overlay value. Top down CDSEM can measure critical dimensions of any structure, it is not dependent of specific target design. It can also measure the overlay errors but only in specific cases like LELE (Litho Etch Litho Etch) after final patterning. In this paper, we will revisit the capability of the CDSEM at final patterning by measuring overlay in dedicated targets as well as inside a logic and an SRAM design. In the dedicated overlay targets, we study the measurement differences between design rules gratings and relaxed pitch gratings. These relaxed pitch which are usually used in IBO or DBO targets. Beyond this "simple" LELE case, we will explore the capability of the CDSEM to measure overlay even if not at final patterning, at litho level. We will assess the hybridization of DBO and CDSEM for reference to optical tools after final patterning. We will show that these reference data can be used to validate the DBO overlay results (correctables and residual fingerprints).

  14. Enhacement of intrafield overlay using a design based metrology system

    Science.gov (United States)

    Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun

    2016-03-01

    As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.

  15. Frequency comb metrology with an optical parametric oscillator.

    Science.gov (United States)

    Balskus, K; Schilt, S; Wittwer, V J; Brochard, P; Ploetzing, T; Jornod, N; McCracken, R A; Zhang, Z; Bartels, A; Reid, D T; Südmeyer, T

    2016-04-18

    We report on the first demonstration of absolute frequency comb metrology with an optical parametric oscillator (OPO) frequency comb. The synchronously-pumped OPO operated in the 1.5-µm spectral region and was referenced to an H-maser atomic clock. Using different techniques, we thoroughly characterized the frequency noise power spectral density (PSD) of the repetition rate frep, of the carrier-envelope offset frequency fCEO, and of an optical comb line νN. The comb mode optical linewidth at 1557 nm was determined to be ~70 kHz for an observation time of 1 s from the measured frequency noise PSD, and was limited by the stability of the microwave frequency standard available for the stabilization of the comb repetition rate. We achieved a tight lock of the carrier envelope offset frequency with only ~300 mrad residual integrated phase noise, which makes its contribution to the optical linewidth negligible. The OPO comb was used to measure the absolute optical frequency of a near-infrared laser whose second-harmonic component was locked to the F = 2→3 transition of the 87Rb D2 line at 780 nm, leading to a measured transition frequency of νRb = 384,228,115,346 ± 16 kHz. We performed the same measurement with a commercial fiber-laser comb operating in the 1.5-µm region. Both the OPO comb and the commercial fiber comb achieved similar performance. The measurement accuracy was limited by interferometric noise in the fibered setup of the Rb-stabilized laser.

  16. LIDAR Metrology for Prescription Characterization and Alignment of Large Mirrors

    Science.gov (United States)

    Eegholm, B.; Eichhorn, W.; von Handorf, R.; Hayden, J.; Ohl, R.; Wenzel, G.

    2011-01-01

    We describe the use of LIDAR, or "laser radar," (LR) as a fast, accurate, and non-contact tool for the measurement of the radius of curvature (RoC) of large mirrors. We report the results of a demonstration of this concept using a commercial laser radar system. We measured the RoC of a 1.4m x 1m spherical mirror with a nominal RoC of 4.6 m with a manufacturing tolerance of 4600mm +/- 6mm. The prescription of the mirror is related to its role as ground support equipment used in the test of part of the James Webb Space Telescope (JWST). The RoC of such a large mirror is not easily measured without contacting the surface. From a position near the center of curvature of the mirror, the LIDAR scanned the mirror surface, sampling it with 1 point per 3.5 sq cm. The measurement consisted of 3983 points and lasted only a few minutes. The laser radar uses the LIDAR signal to provide range, and encoder information from angular azimuth and elevation rotation stages provide the spherical coordinates of a given point. A best-fit to a sphere of the measured points was performed. The resulting RoC was within 20 ppm of the nominal RoC, also showing good agreement with the results of a laser tracker-based, contact metrology. This paper also discusses parameters such as test alignment, scan density, and optical surface type, as well as future possible application for full prescription characterization of aspherical mirrors, including radius, conic, off-axis distance, and aperture.

  17. Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

    Science.gov (United States)

    Pendrill, L. R.; Fisher, William P., Jr.

    2013-09-01

    A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity.

  18. Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors

    Energy Technology Data Exchange (ETDEWEB)

    Berujon, S., E-mail: berujon@esrf.eu; Ziegler, E., E-mail: ziegler@esrf.eu; Cunha, S. da; Bonneau, F.; Baker, R.; Clement, J.-M.; Perez, M.; Thuaudet, S.; Malandrino, G.; Vivo, A.; Lantelme, B.; Barrett, R.; Susini, J. [European Synchrotron Radiation Facility, CS40220, 38043 Grenoble Cedex 9 (France)

    2016-07-27

    A new figuring station was designed and installed at the ESRF beamline BM05. It allows the figuring of mirrors within an iterative process combining the advantage of online metrology with dry etching. The complete process takes place under a vacuum environment to minimize surface contamination while non-contact surfacing tools open up the possibility of performing at-wavelength metrology and eliminating placement errors. The aim is to produce mirrors whose slopes do not deviate from the stigmatic profile by more than 0.1 µrad rms while keeping surface roughness in the acceptable limit of 0.1-0.2 nm rms. The desired elliptical mirror surface shape can be achieved in a few iterations in about a one day time span. This paper describes some of the important aspects of the process regarding both the online metrology and the etching process.

  19. 3D-SEM Metrology for Coordinate Measurements at the Nanometer Scale

    DEFF Research Database (Denmark)

    Carli, Lorenzo

    The present work deals with a study concerning 3D-SEM metrology as a tool for coordinate measurements at the nanometer scale. The relevance of 3D-SEM, based on stereophotogrammetry technique, has been highlighted with respect to the other measuring instruments nowadays available and the main issues...... to be addressed concerning uncertainty evaluation have been discussed. Most recent developments in the field of micro and nano-metrology, in terms of measuring machines and techniques, are described pointing out advantages and limitations. The importance of multi-sensor and multi-orientation strategy...... to 3D reconstructions, are given and the main phases involved in stereophotogrammetry technique are described underlying the most relevant error sources in the case of 2D and 3D-SEM metrology. An uncertainty evaluation has been thus carried out in accordance with ISO GUM, following a holistic approach...

  20. Recent developments in radon metrology: new aspects in the calibration of radon, thoron and progeny devices.

    Science.gov (United States)

    Röttger, A; Honig, A

    2011-05-01

    Due to the importance of reliable measurements of radon activity concentration, one of the past developments in metrology was applied to the field of radon, thus meeting two basic needs: (1) the harmonisation of metrology within the scope of the mutual recognition arrangement, an arrangement drawn up by the International Committee of Weights and Measures for the mutual recognition of national standards and of calibrations issued by national metrology institutes and (2) the increased demands of the European Atomic Energy Community (EURATOM) directive, transferred into national radiation protection regulations with regard to natural radioactivity and its quality-assured measurements. This paper gives an overview of typical technical procedures in the radon-measuring technique group of PTB, covering all aspects of reference atmospheres (primary standards) for radon, thoron and their respective progenies.

  1. Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique.

    Science.gov (United States)

    Wang, Hongchang; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal

    2015-07-01

    In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

  2. Advanced in situ metrology for x-ray beam shaping with super precision.

    Science.gov (United States)

    Wang, Hongchang; Sutter, John; Sawhney, Kawal

    2015-01-26

    We report a novel method for in situ metrology of an X-ray bimorph mirror by using the speckle scanning technique. Both the focusing beam and the "tophat" defocussed beam have been generated by optimizing the bimorph mirror in a single iteration. Importantly, we have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach accuracy in the range of two nanoradians. When compared with conventional ex-situ metrology techniques, the method enables a substantial increase of around two orders of magnitude in the angular sensitivity and opens the way to a previously inaccessible region of slope error measurement. Such a super precision metrology technique will be beneficial for both the manufacture of polished mirrors and the optimization of beam shaping.

  3. Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Hongchang, E-mail: hongchang.wang@diamond.ac.uk; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal [Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

    2015-06-06

    The two-dimensional slope error of an X-ray mirror has been retrieved by employing the speckle scanning technique, which will be valuable at synchrotron radiation facilities and in astronomical telescopes. In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

  4. Corner cube model for Microarcsec Metrology (MAM) testbed in Space Interferometer Mission (SIM)

    Science.gov (United States)

    Wang, Xu

    2005-02-01

    A corner cube model is developed to calculate the SIM internal metrology optical delay bias (with the accuracy of picometer) due to the component imperfections, such as vertex offset, coating index error, dihedral error, and gimbal offset. This physics-based and Matlab-implemented ray-trace model provides useful guidance on the flight system design, integration, and characterization. In this paper, the details of the corner cube model will be described first. Then the sub-nanometer level model validation through the MAM testbed will be presented. Finally several examples of the model application, such as the metrology delay bias minimization, design parameter error budget (or tolerance) allocation, and the metrology beam prints visualization, will be shown.

  5. Physical characterization and performance evaluation of an x-ray micro-computed tomography system for dimensional metrology applications

    DEFF Research Database (Denmark)

    Hiller, Jochen; Maisl, Michael; Reindl, Leonard M

    2012-01-01

    This paper presents physical and metrological characterization measurements conducted for an industrial x-ray micro-computed tomography (CT) system. As is well known in CT metrology, many factors, e.g., in the scanning and reconstruction process, the image processing, and the 3D data evaluation...

  6. Improving Software Developer's Competence

    DEFF Research Database (Denmark)

    Abrahamsson, Pekka; Kautz, Karlheinz; Sieppi, Heikki

    2002-01-01

    Emerging agile software development methods are people oriented development approaches to be used by the software industry. The personal software process (PSP) is an accepted method for improving the capabilities of a single software engineer. Five original hypotheses regarding the impact...

  7. Ensuring Software IP Cleanliness

    Directory of Open Access Journals (Sweden)

    Mahshad Koohgoli

    2007-12-01

    Full Text Available At many points in the life of a software enterprise, determination of intellectual property (IP cleanliness becomes critical. The value of an enterprise that develops and sells software may depend on how clean the software is from the IP perspective. This article examines various methods of ensuring software IP cleanliness and discusses some of the benefits and shortcomings of current solutions.

  8. Improving Software Developer's Competence

    DEFF Research Database (Denmark)

    Abrahamsson, Pekka; Kautz, Karlheinz; Sieppi, Heikki

    2002-01-01

    Emerging agile software development methods are people oriented development approaches to be used by the software industry. The personal software process (PSP) is an accepted method for improving the capabilities of a single software engineer. Five original hypotheses regarding the impact...

  9. Agile Software Development

    Science.gov (United States)

    Biju, Soly Mathew

    2008-01-01

    Many software development firms are now adopting the agile software development method. This method involves the customer at every level of software development, thus reducing the impact of change in the requirement at a later stage. In this article, the principles of the agile method for software development are explored and there is a focus on…

  10. Software distribution using xnetlib

    Energy Technology Data Exchange (ETDEWEB)

    Dongarra, J.J. [Univ. of Tennessee, Knoxville, TN (US). Dept. of Computer Science]|[Oak Ridge National Lab., TN (US); Rowan, T.H. [Oak Ridge National Lab., TN (US); Wade, R.C. [Univ. of Tennessee, Knoxville, TN (US). Dept. of Computer Science

    1993-06-01

    Xnetlib is a new tool for software distribution. Whereas its predecessor netlib uses e-mail as the user interface to its large collection of public-domain mathematical software, xnetlib uses an X Window interface and socket-based communication. Xnetlib makes it easy to search through a large distributed collection of software and to retrieve requested software in seconds.

  11. Image Processing Software

    Science.gov (United States)

    Bosio, M. A.

    1990-11-01

    ABSTRACT: A brief description of astronomical image software is presented. This software was developed in a Digital Micro Vax II Computer System. : St presenta una somera descripci6n del software para procesamiento de imagenes. Este software fue desarrollado en un equipo Digital Micro Vax II. : DATA ANALYSIS - IMAGE PROCESSING

  12. Agile Software Development

    Science.gov (United States)

    Biju, Soly Mathew

    2008-01-01

    Many software development firms are now adopting the agile software development method. This method involves the customer at every level of software development, thus reducing the impact of change in the requirement at a later stage. In this article, the principles of the agile method for software development are explored and there is a focus on…

  13. Software productivity improvement through software engineering technology

    Science.gov (United States)

    Mcgarry, F. E.

    1985-01-01

    It has been estimated that NASA expends anywhere from 6 to 10 percent of its annual budget on the acquisition, implementation and maintenance of computer software. Although researchers have produced numerous software engineering approaches over the past 5-10 years; each claiming to be more effective than the other, there is very limited quantitative information verifying the measurable impact htat any of these technologies may have in a production environment. At NASA/GSFC, an extended research effort aimed at identifying and measuring software techniques that favorably impact productivity of software development, has been active over the past 8 years. Specific, measurable, software development technologies have been applied and measured in a production environment. Resulting software development approaches have been shown to be effective in both improving quality as well as productivity in this one environment.

  14. Great software debates

    CERN Document Server

    Davis, A

    2004-01-01

    The industry’s most outspoken and insightful critic explains how the software industry REALLY works. In Great Software Debates, Al Davis, shares what he has learned about the difference between the theory and the realities of business and encourages you to question and think about software engineering in ways that will help you succeed where others fail. In short, provocative essays, Davis fearlessly reveals the truth about process improvement, productivity, software quality, metrics, agile development, requirements documentation, modeling, software marketing and sales, empiricism, start-up financing, software research, requirements triage, software estimation, and entrepreneurship.

  15. An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

    Energy Technology Data Exchange (ETDEWEB)

    Settens, Charles M. [State Univ. of New York (SUNY), Albany, NY (United States)

    2015-01-01

    Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron critical dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.

  16. The system software development for Prime Focus Spectrogrsph on Subaru Telescope

    CERN Document Server

    ,

    2012-01-01

    The Prime Focus Spectrograph (PFS) is a wide field multi-fiber spectrograph using the prime focus of the Subaru telescope, which is capable of observing up to 2400 astronomical objects simultaneously. The instrument control software will manage the observation procedure communicateing with subsystems such as the fiber positioner "COBRA", the metrology camera system, and the spectrograph and camera systems. Before an exposure starts, the instrument control system needs to access to a database where target lists provided by observers are stored in advance, and accurately position fibers onto astronomical targets as requested therein. This fiber positioning will be carried out interacting with the metrology system which measures the fiber positions. In parallel, the control system can issue a command to point the telescope to the target position and to rotate the instrument rotator. Finally the telescope pointing and the rotator angle will be checked by imaging bright stars and checking their positions on the au...

  17. Software Engineering for Practiced Software Enhancement

    Directory of Open Access Journals (Sweden)

    Rashmi Yadav

    2011-03-01

    Full Text Available Software development scenario particularly in IT industries is very competitive and demands for development with minimum resources. Software development started and prevailed up to an extent in industry without the use of software engineering practices, which was perceived as an overhead. This approach causes over use of resources, such as money, man-hours, hardware components. This paper attempts to present the causes of inefficiencies in an almost exhaustive way. Further, an attempt has been made to elaborate the software engineering methods as remedies against the listed causes of inefficiencies of development.

  18. Software Metrics for Identifying Software Size in Software Development Projects

    Directory of Open Access Journals (Sweden)

    V.S.P Vidanapathirana

    2015-11-01

    Full Text Available Measurements are fundamental any engineering discipline. They indicate the amount, extent, dimension or capacity of an attribute or a product, in a quantitative manner. The analyzed results of the measured data can be given as the basic idea of metrics. It is a quantitative representation of the measurements of the degree to which a system, component, or process possesses a given attribute. When it comes to software, the metrics are a wide scope of measurements of computer programming. The size oriented metrics takes a main role in it since they can be used as the key for better estimations, to improve trust and confidence, and to have a better control over the software products. Software professionals traditionally have been measuring the size of software applications by using several methods. In this paper the researchers discuss about the software size metrics for identifying software size and it is mainly focused on the software development projects in today’s Information Technology (IT industry.

  19. Software Cost Estimation Review

    OpenAIRE

    Ongere, Alphonce

    2013-01-01

    Software cost estimation is the process of predicting the effort, the time and the cost re-quired to complete software project successfully. It involves size measurement of the soft-ware project to be produced, estimating and allocating the effort, drawing the project schedules, and finally, estimating overall cost of the project. Accurate estimation of software project cost is an important factor for business and the welfare of software organization in general. If cost and effort estimat...

  20. Software Partitioning Technologies

    Science.gov (United States)

    2001-05-29

    1 Software Partitioning Technologies Tim Skutt Smiths Aerospace 3290 Patterson Ave. SE Grand Rapids, MI 49512-1991 (616) 241-8645 skutt_timothy...Limitation of Abstract UU Number of Pages 12 2 Agenda n Software Partitioning Overview n Smiths Software Partitioning Technology n Software Partitioning...Partition Level OS Core Module Level OS Timers MMU I/O API Layer Partitioning Services 6 Smiths Software Partitioning Technology n Smiths has developed

  1. Scaffold characterization using NLO multimodal microscopy in metrology for regenerative medicine

    Science.gov (United States)

    Mortati, Leonardo; Divieto, Carla; Boffitto, Monica; Sartori, Susanna; Ciardelli, Gianluca; Sassi, Maria Paola

    2013-09-01

    Metrology in regenerative medicine aims to develop traceable measurement technologies for characterizing cellular and macromolecule behaviour in regenerative medicine products and processes. One key component in regenerative medicine is using three-dimensional porous scaffolds to guide cells during the regeneration process. The regeneration of specific tissues guided by tissue analogous substrates is dependent on diverse scaffold architectural properties that can be derived quantitatively from scaffolds images. This paper discuss the results obtained with the multimodal NLO microscope recently realized in our laboratory in characterizing 3D tissue engineered (TE) scaffolds colonized from human Mesenchimal stem cells (hMSC), focusing on the study of the three-dimensional metrological parameters.

  2. Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

    Energy Technology Data Exchange (ETDEWEB)

    Yashchuk, Valeriy V; Barber, Samuel; Domning, Edward E.; Kirschman, Jonathan L.; Morrison, Gregory Y.; Smith, Brian V; Siewert, Frank; Zeschke, Thomas; Geckeler, Ralf; Just, Andreas

    2009-09-11

    A new low budget slope measuring instrument, the Developmental Long Trace Profiler (DLTP), was recently brought to operation at the ALS Optical Metrology Laboratory. The design, instrumental control and data acquisition system, initial alignment and calibration procedures, as well as the developed experimental precautions and procedures are described in detail. The capability of the DLTP to achieve sub-microradian surface slope metrology is verified via cross-comparison measurements with other high performance slope measuring instruments when measuring the same high quality test optics. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.

  3. 法制计量之我见%Some views on legal metrology

    Institute of Scientific and Technical Information of China (English)

    王明轩

    2014-01-01

    描述了法制计量的几种定义,并结合法制计量的定义,浅述了自己在计量管理方面如何完善法规建设、强化管理监督以及加强队伍建设的一些观点。%describes several kinds of definition, legal metrology and combined with the definition of legal metrology, in his own measurement management and how to perfect the construction of the rule of law, strengthen management oversight, and strengthen the team construction of some points.

  4. Dimensional metrology for process and part quality control in micro manufacturing

    DEFF Research Database (Denmark)

    Hansen, Hans Nørgaard; Tosello, Guido; Gasparin, Stefania

    2011-01-01

    Micro manufacturing has gained interest over the last decade as the demand for micro mechanical components has increased. The need for dimensional metrology at micro scale is evident both in terms of quality assurance of components and products and in terms of process control. As critical...... manufacturing is to develop into industrial manufacturing solutions. In this paper the application of dimensional precision metrology to both component and process quality control will be demonstrated. The parts investigated are micro injection moulded polymer parts, typical for the field of micro manufacturing....

  5. Review of the mathematical foundations of data fusion techniques in surface metrology

    Science.gov (United States)

    Wang, Jian; Leach, Richard K.; Jiang, X.

    2015-06-01

    The recent proliferation of engineered surfaces, including freeform and structured surfaces, is challenging current metrology techniques. Measurement using multiple sensors has been proposed to achieve enhanced benefits, mainly in terms of spatial frequency bandwidth, which a single sensor cannot provide. When using data from different sensors, a process of data fusion is required and there is much active research in this area. In this paper, current data fusion methods and applications are reviewed, with a focus on the mathematical foundations of the subject. Common research questions in the fusion of surface metrology data are raised and potential fusion algorithms are discussed.

  6. Metrology with PT-Symmetric Cavities: Enhanced Sensitivity near the PT-Phase Transition.

    Science.gov (United States)

    Liu, Zhong-Peng; Zhang, Jing; Özdemir, Şahin Kaya; Peng, Bo; Jing, Hui; Lü, Xin-You; Li, Chun-Wen; Yang, Lan; Nori, Franco; Liu, Yu-Xi

    2016-09-09

    We propose and analyze a new approach based on parity-time (PT) symmetric microcavities with balanced gain and loss to enhance the performance of cavity-assisted metrology. We identify the conditions under which PT-symmetric microcavities allow us to improve sensitivity beyond what is achievable in loss-only systems. We discuss the application of PT-symmetric microcavities to the detection of mechanical motion, and show that the sensitivity is significantly enhanced near the transition point from unbroken- to broken-PT regimes. Our results open a new direction for PT-symmetric physical systems and it may find use in ultrahigh precision metrology and sensing.

  7. Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology.

    Science.gov (United States)

    Assoufid, Lahsen; Goldberg, Kenneth; Yashchuk, Valeriy V

    2016-05-01

    Recent developments in synchrotron storage rings and free-electron laser-based x-ray sources with ever-increasing brightness and coherent flux have pushed x-ray optics requirements to new frontiers. This Special Topic gathers a set of articles derived from a subset of the key presentations of the International Workshop on X-ray Mirrors Fabrication (IWXM-2015) and Metrology held at Lawrence Berkley National Laboratory, Berkeley, California, USA, July 14-16, 2015. The workshop objective was to report on recent progress in x-ray synchrotron radiation mirrors fabrication as well as on new developments in related metrology tools and methods.

  8. Nano-metrology and terrain modelling - convergent practice in surface characterisation

    Science.gov (United States)

    Pike, R.J.

    2000-01-01

    The quantification of magnetic-tape and disk topography has a macro-scale counterpart in the Earth sciences - terrain modelling, the numerical representation of relief and pattern of the ground surface. The two practices arose independently and continue to function separately. This methodological paper introduces terrain modelling, discusses its similarities to and differences from industrial surface metrology, and raises the possibility of a unified discipline of quantitative surface characterisation. A brief discussion of an Earth-science problem, subdividing a heterogeneous terrain surface from a set of sample measurements, exemplifies a multivariate statistical procedure that may transfer to tribological applications of 3-D metrological height data.

  9. Review of the Technical Metrological Regulation for flow computers and volume converters

    Science.gov (United States)

    Almeida, R. O.; Aguiar Júnior, E. A.; Costa-Felix, R. P. B.

    2016-07-01

    With the publication of Inmetro's regulation n° 373/2014, Inmetro presented the proposal to review the regulation of flow computers and volume converters, whose scope now includes fiscal measurement, ownership, custody transfer, among others, of hydrocarbons liquids and natural gas. This new proposal provides improvements to the legal metrological control of these instruments in Brazil, while also broaden the scope from the previous regulation, the Inmetro's regulation n° 64/2003. The purpose of this paper is to present these changes from a metrological point of view, and also clarify the transitional rules for the process.

  10. Axiomatic definition of quantity as a basis for teaching metrology in Mechanical Engineering

    Science.gov (United States)

    Muravyov, S. V.; Ramamoorthy, B.

    2016-11-01

    In spite of satisfactory availability of didactical material, there exist some problems in teaching metrology that are conditioned by rather outdated common view on the role and position of this subject in the overall discipline of Mechanical Engineering, as well as in other engineering branches. In fact, in the last ten years, many changes have occurred in metrology both as a science itself and as a practical activity on measurement uniformity support. Terminology, concerning essential elements of measurement process and measurement situation, has been revised to a large extent. In the paper, certain recommendations are given on a shift of the subject teaching paradigm and its contents.

  11. Frequency and time transfer for metrology and beyond using telecommunication network fibres

    CERN Document Server

    Lopez, Olivier; Jiang, Haifeng; Haboucha, Adil; Bercy, Anthony; Stefani, Fabio; Chanteau, Bruno; Kanj, Amale; Rovera, Daniele; Achkar, Joseph; Chardonnet, Christian; Pottie, Paul-Eric; Amy-Klein, Anne; Santarelli, Giorgio

    2015-01-01

    The distribution and the comparison of an ultra-stable optical frequency and accurate time using optical fibres have been greatly improved in the last ten years. The frequency stability and accuracy of optical links surpass well-established methods using the global navigation satellite system and geostationary satellites. In this paper, we present a review of the methods and the results obtained. We show that public telecommunication network carrying Internet data can be used to compare and distribute ultra-stable metrological signals over long distances. This novel technique paves the way for the deployment of a national and continental ultra-stable metrological optical network.

  12. Metrological evaluation of characterization methods applied to nuclear fuels

    Energy Technology Data Exchange (ETDEWEB)

    Faeda, Kelly Cristina Martins; Lameiras, Fernando Soares; Camarano, Denise das Merces; Ferreira, Ricardo Alberto Neto; Migliorini, Fabricio Lima; Carneiro, Luciana Capanema Silva; Silva, Egonn Hendrigo Carvalho, E-mail: kellyfisica@gmail.co, E-mail: fernando.lameiras@pq.cnpq.b, E-mail: dmc@cdtn.b, E-mail: ranf@cdtn.b, E-mail: flmigliorini@hotmail.co, E-mail: lucsc@hotmail.co, E-mail: egonn@ufmg.b [Centro de Desenvolvimento da Tecnologia Nuclear (CDTN/CNEN-MG), Belo Horizonte, MG (Brazil)

    2010-07-01

    In manufacturing the nuclear fuel, characterizations are performed in order to assure the minimization of harmful effects. The uranium dioxide is the most used substance as nuclear reactor fuel because of many advantages, such as: high stability even when it is in contact with water at high temperatures, high fusion point, and high capacity to retain fission products. Several methods are used for characterization of nuclear fuels, such as thermogravimetric analysis for the ratio O / U, penetration-immersion method, helium pycnometer and mercury porosimetry for the density and porosity, BET method for the specific surface, chemical analyses for relevant impurities, and the laser flash method for thermophysical properties. Specific tools are needed to control the diameter and the sphericity of the microspheres and the properties of the coating layers (thickness, density, and degree of anisotropy). Other methods can also give information, such as scanning and transmission electron microscopy, X-ray diffraction, microanalysis, and mass spectroscopy of secondary ions for chemical analysis. The accuracy of measurement and level of uncertainty of the resulting data are important. This work describes a general metrological characterization of some techniques applied to the characterization of nuclear fuel. Sources of measurement uncertainty were analyzed. The purpose is to summarize selected properties of UO{sub 2} that have been studied by CDTN in a program of fuel development for Pressurized Water Reactors (PWR). The selected properties are crucial for thermalhydraulic codes to study basic design accidents. The thermal characterization (thermal diffusivity and thermal conductivity) and the penetration immersion method (density and open porosity) of UO{sub 2} samples were focused. The thermal characterization of UO{sub 2} samples was determined by the laser flash method between room temperature and 448 K. The adaptive Monte Carlo Method was used to obtain the endpoints of

  13. Metrology camera system of prime focus spectrograph for Suburu telescope

    Science.gov (United States)

    Wang, Shiang-Yu; Chou, Richard C. Y.; Huang, Pin-Jie; Ling, Hung-Hsu; Karr, Jennifer; Chang, Yin-Chang; Hu, Yen-Sang; Hsu, Shu-Fu; Chen, Hsin-Yo; Gunn, James E.; Reiley, Dan J.; Tamura, Naoyuki; Takato, Naruhisa; Shimono, Atsushi

    2016-08-01

    The Prime Focus Spectrograph (PFS) is a new optical/near-infrared multi-fiber spectrograph designed for the prime focus of the 8.2m Subaru telescope. PFS will cover a 1.3 degree diameter field with 2394 fibers to complement the imaging capabilities of Hyper SuprimeCam. To retain high throughput, the final positioning accuracy between the fibers and observing targets of PFS is required to be less than 10 microns. The metrology camera system (MCS) serves as the optical encoder of the fiber motors for the configuring of fibers. MCS provides the fiber positions within a 5 microns error over the 45 cm focal plane. The information from MCS will be fed into the fiber positioner control system for the closed loop control. MCS will be located at the Cassegrain focus of Subaru telescope in order to cover the whole focal plane with one 50M pixel Canon CMOS camera. It is a 380mm Schmidt type telescope which generates a uniform spot size with a 10 micron FWHM across the field for reasonable sampling of the point spread function. Carbon fiber tubes are used to provide a stable structure over the operating conditions without focus adjustments. The CMOS sensor can be read in 0.8s to reduce the overhead for the fiber configuration. The positions of all fibers can be obtained within 0.5s after the readout of the frame. This enables the overall fiber configuration to be less than 2 minutes. MCS will be installed inside a standard Subaru Cassgrain Box. All components that generate heat are located inside a glycol cooled cabinet to reduce the possible image motion due to heat. The optics and camera for MCS have been delivered and tested. The mechanical parts and supporting structure are ready as of spring 2016. The integration of MCS will start in the summer of 2016. In this report, the performance of the MCS components, the alignment and testing procedure as well as the status of the PFS MCS will be presented.

  14. Remote photonic metrology in the conservation of cultural heritage

    Science.gov (United States)

    Tornari, Vivi; Pedrini, G.; Osten, W.

    2013-05-01

    not only remote research, inspection and evaluation, but also providing the results to the members and the public with instant and simultaneous access to necessary information, knowledge and technologies. In this paper it is presented the concept and first results confirming the potential of implementing metrology techniques as remote digital laboratory facilities in artwork structural assessment. The method paves the way of the general objective to introduce remote photonic technologies in the sensitive field of Cultural Heritage.

  15. Metrological aspects to quality control for natural gas analyses

    Energy Technology Data Exchange (ETDEWEB)

    Ribeiro, Claudia Cipriano; Borges, Cleber Nogueira; Cunha, Valnei S. [Instituto Nacional de Metrologia, Normalizacao e Qualidade Industrial (INMETRO), Rio de Janeiro, RJ (Brazil); Augusto, Cristiane R. [Universidade Federal do Rio de Janeiro (UFRJ), RJ (Brazil); Augusto, Marco Ignazio [Companhia Estadual de Gas do Rio de Janeiro (CEG), RJ (Brazil)

    2008-07-01

    The Product's Quality and Services are fundamental topics in the globalized commercial relationship inclusive concern the measurements in natural gas. Considerable investments were necessary for industry especially about the quality control in the commercialized gas with an inclusion of the natural gas in Brazilian energetic resources The Brazilian Regulatory Agency, ANP - Agencia Nacional de Petroleo, Gas Natural e Biocombustiveis - created the Resolution ANP no.16. This Resolution defines the natural gas specification, either national or international source, for commercialization in Brazil and list the tolerance concentration for some components. Between of this components are the inert compounds like the CO{sub 2} and N{sub 2}. The presence of this compounds reduce the calorific power, apart from increase the resistance concern the detonation in the case of vehicular application, and occasion the reduction in the methane concentration in the gas. Controls charts can be useful to verify if the process are or not under Statistical Control. The process can be considerate under statistical control if the measurements have it values between in lower and upper limits stated previously The controls charts can be approach several characteristics in each subgroup: means, standard deviations, amplitude or proportion of defects. The charts are draws for a specific characteristic and to detect some deviate in the process under specific environment conditions. The CEG - Companhia de Distribuicao de Gas do Rio de Janeiro and the DQUIM - Chemical Metrology Division has an agreement for technical cooperation in research and development of gas natural composition Concern the importance of the natural gas in the Nation development, as well as the question approaching the custody transference, the objective of this work is demonstrate the control quality of the natural gas composition between the CEG laboratory and the DQUIM laboratory aiming the quality increase of the

  16. Software Engineering Program: Software Process Improvement Guidebook

    Science.gov (United States)

    1996-01-01

    The purpose of this document is to provide experience-based guidance in implementing a software process improvement program in any NASA software development or maintenance community. This guidebook details how to define, operate, and implement a working software process improvement program. It describes the concept of the software process improvement program and its basic organizational components. It then describes the structure, organization, and operation of the software process improvement program, illustrating all these concepts with specific NASA examples. The information presented in the document is derived from the experiences of several NASA software organizations, including the SEL, the SEAL, and the SORCE. Their experiences reflect many of the elements of software process improvement within NASA. This guidebook presents lessons learned in a form usable by anyone considering establishing a software process improvement program within his or her own environment. This guidebook attempts to balance general and detailed information. It provides material general enough to be usable by NASA organizations whose characteristics do not directly match those of the sources of the information and models presented herein. It also keeps the ideas sufficiently close to the sources of the practical experiences that have generated the models and information.

  17. Payload software technology: Software technology development plan

    Science.gov (United States)

    1977-01-01

    Programmatic requirements for the advancement of software technology are identified for meeting the space flight requirements in the 1980 to 1990 time period. The development items are described, and software technology item derivation worksheets are presented along with the cost/time/priority assessments.

  18. Pragmatic Software Innovation

    DEFF Research Database (Denmark)

    Aaen, Ivan; Jensen, Rikke Hagensby

    2014-01-01

    We understand software innovation as concerned with introducing innovation into the development of software intensive systems, i.e. systems in which software development and/or integration are dominant considerations. Innovation is key in almost any strategy for competitiveness in existing markets......, for creating new markets, or for curbing rising public expenses, and software intensive systems are core elements in most such strategies. Software innovation therefore is vital for about every sector of the economy. Changes in software technologies over the last decades have opened up for experimentation...

  19. Demonstration of Parallel Scanning Probe Microscope for high throughput metrology and inspection

    NARCIS (Netherlands)

    Sadeghian Marnani, H.; Dekker, A.; Herfst, R.W.; Winters, J.; Eigenraam, A.B.C.; Rijnbeek, R.A.; Nulkes, N.

    2015-01-01

    With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D and the throughput. Due to the advantages of sub-n

  20. High-speed AFM for 1x node metrology and inspection: does it damage the features?

    NARCIS (Netherlands)

    Sadeghian Marnani, H.; Dool, T.C. van den; Uziel, Y.; Bar Or, R.

    2015-01-01

    This paper aims at unraveling the mystery of damage in high speed AFMs for 1X node and below. With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in ter

  1. Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

    Science.gov (United States)

    Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael; Mclean, Kyle F.; McMann, Joseph; Melf, Markus; Miner, Linda; Ohl, Raymond G.; Redman, Kevin; Roedel, Andreas; Schweiger, Paul; Plate, Maurice T.; Wells, Martyn; Wenzel, Greg W.; Williams, Patrick K.; Young, Jerrod

    2014-01-01

    The James Webb Space Telescope science instruments are in the final stages of being integrated into the Integrated Science Instrument Module (ISIM) element. Each instrument is tied into a common coordinate system through mechanical references that are used for optical alignment and metrology within ISIM after element-level assembly. In addition, a set of ground support equipment (GSE) consisting of large, precisely calibrated, ambient, and cryogenic structures are used as alignment references and gauges during various phases of integration and test (I&T). This GSE, the flight instruments, and ISIM structure feature different types of complimentary metrology targeting. These GSE targets are used to establish and track six degrees of freedom instrument alignment during I&T in the vehicle coordinate system (VCS). This paper describes the optomechanical metrology conducted during science instrument integration and alignment in the Spacecraft Systems Development and Integration Facility (SSDIF) cleanroom at NASA Goddard Space Flight Center (GSFC). The measurement of each instrument's ambient entrance pupil location in the telescope coordinate system is discussed. The construction of the database of target locations and the development of metrology uncertainties is also discussed.

  2. Laser metrology applied to the nuclear maintenance; Metrologia laser aplicada al mantenimiento nuclear

    Energy Technology Data Exchange (ETDEWEB)

    Garrido Garcia, J.; Sarti Fernandez, F.

    2012-07-01

    The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

  3. Automated metrology and NDE measurements for increased throughput in aerospace component manufacture

    Science.gov (United States)

    MacLeod, Charles N.; Pierce, S. Gareth; Morozov, Maxim; Summan, Rahul; Dobie, Gordon; McCubbin, Paul; McCubbin, Coreen; Dearie, Scott; Munro, Gavin

    2015-03-01

    Composite materials, particularly Carbon-Fibre-Reinforced Polymer (CFRP), find extensive use in construction of modern airframe structures. Quality and conformance checks can be a serious limitation on production throughput in aerospace manufacturing. Traditionally Non-Destructive Evaluation (NDE) and metrology measurements are undertaken at different stages of a product manufacture cycle using specific dedicated equipment and personnel. However, since both processes involve direct interaction with the component's surface, an opportunity exists to combine these to potentially reduce overall cycle time. In addition when considering moves towards automation of both inspection processes, it is clear that measured metrology data is an essential input parameter to the automated NDE workflow. The authors present the findings of a proof of concept combined sub-scale NDE and Metrology demonstrator cell for aerospace components. Permitting a maximum part area size of 3 × 1 m2, KUKA KR5 6 degree of freedom robotic manipulators were utilised to deploy two inspection payloads. Firstly automated non-contact photogrammetric metrology measurement was employed to inspect the structure for conformance of dimension in relation to reference designs (available from CAD). Secondly automated phased array technology was deployed to inspect and produce ultrasonic thickness mapping of components of nominal 20mm thickness. Parameters such as overall cycle time, part dimensional accuracy, robotic path accuracy and data registration are assessed in the paper to highlight both the current state of the art performance available and the future direction of required research focus.

  4. Proficiency testing in the light of a new rationale in metrology

    DEFF Research Database (Denmark)

    Heydorn, Kaj

    2008-01-01

    The novel proposed definition of measurement result in the international metrology vocabulary requires a revision of standards and guidelines for proficiency testing (PT), and a new approach to processing proficiency data is needed to test the ability of laboratories to present not only unbiased...

  5. The role of metrology in mediating and mobilizing the language and culture of scientific facts

    Science.gov (United States)

    Fisher, W. P., Jr.; Stenner, A. J.

    2015-02-01

    The self-conscious awareness of language and its use is arguably nowhere more intense than in metrology. The careful and deliberate coordination and alignment of shared metrological frames of reference for theory, experiment, and practical application have been characteristics of scientific culture at least since the origins of the SI units in revolutionary France. Though close attention has been focused on the logical and analytical aspects of language use in science, little concern has been shown for understanding how the social and historical aspects of everyday language may have foreshadowed and influenced the development and character of metrological language, especially relative to the inevitably partial knowledge possessed by any given stakeholder participating in the scientific enterprise. Insight in this regard may be helpful in discerning how and if an analogous role for metrology might be created in psychology and the social sciences. It may be that the success of psychology as a science will depend less on taking physics as the relevant model than on attending to the interplay of concepts, models, and social organization that make any culture effective.

  6. Model-based optical metrology and visualization of 3-D complex objects

    Institute of Scientific and Technical Information of China (English)

    LIU Xiao-li; LI A-meng; ZHAO Xiao-bo; GAO Peng-dong; TIAN Jin-dong; PENG Xiang

    2007-01-01

    This letter addresses several key issues in the process of model-based optical metrology, including three dimensional (3D) sensing, calibration, registration and fusion of range images, geometric representation, and visualization of reconstructed 3D model by taking into account the shape measurement of 3D complex structures,and some experimental results are presented.

  7. Estimation of measurement uncertainties in X-ray computed tomography metrology using the substitution method

    DEFF Research Database (Denmark)

    Müller, Pavel; Hiller, Jochen; Dai, Y.

    2014-01-01

    This paper presents the application of the substitution method for the estimation of measurement uncertainties using calibrated workpieces in X-ray computed tomography (CT) metrology. We have shown that this, well accepted method for uncertainty estimation using tactile coordinate measuring...

  8. Demonstration of parallel scanning probe microscope for high throughput metrology and inspection

    Science.gov (United States)

    Sadeghian, Hamed; Dekker, Bert; Herfst, Rodolf; Winters, Jasper; Eigenraam, Alexander; Rijnbeek, Ramon; Nulkes, Nicole

    2015-03-01

    With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D and the throughput. Due to the advantages of sub-nanometer resolution and the ability of true 3D scanning, scanning probe microscope (SPM) and specifically atomic force microscope (AFM) are considered as alternative technologies for CD-metrology, defect inspection and review of 1X node and below. In order to meet the increasing demand for resolution and throughput of CD-metrology, defect inspection and review, TNO has previously introduced the parallel SPM concept, consisting of parallel operation of many miniaturized SPMs on a 300 and 450 mm wafer. In this paper we will present the proof of principle of the parallelization for metrology and inspection. To give an indication of the system's specifications, the throughput of scanning is 4500 sites per hour, each within an area of 1 μm2 and 1024 ×1024 pixels.

  9. Nuclear Technology. Course 27: Metrology. Module 27-3, Gage Blocks, Mechanical Comparators and Electronic Comparators.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This third in a series of eight modules for a course titled Metrology describes gage blocks and mechanical and electronic comparators. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6) materials needed, (7)…

  10. Reference Materials for Food and Nutrition Metrology: Past, Present and Future

    Science.gov (United States)

    Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970’s the first “biological” RM of Bowens Kale, as well as Orchard Leaves and Bovine Liver SRMs, from the ...

  11. Nuclear Technology. Course 27: Metrology. Module 27-2, Fixed Gages, Dividers, Calipers, and Micrometers.

    Science.gov (United States)

    Selleck, Ben; Espy, John

    This second in a series of eight modules for a course titled Metrology dscribes fixed gages, dividers, calipers, vernier and dial calipers, and micrometers. The module follows a typical format that includes the following sections: (l) introduction, (2) module prerequisites, (3) objectives, (4) notes to instructor/student, (5) subject matter, (6)…

  12. Quantum Metrology: Surpassing the shot-noise limit with Dzyaloshinskii-Moriya interaction.

    Science.gov (United States)

    Ozaydin, Fatih; Altintas, Azmi Ali

    2015-11-09

    Entanglement is at the heart of quantum technologies such as quantum information and quantum metrology. Providing larger quantum Fisher information (QFI), entangled systems can be better resources than separable systems in quantum metrology. However the effects on the entanglement dynamics such as decoherence usually decrease the QFI considerably. On the other hand, Dzyaloshinskii-Moriya (DM) interaction has been shown to excite entanglement. Since an increase in entanglement does not imply an increase in QFI, and also there are cases where QFI decreases as entanglement increases, it is interesting to study the influence of DM interaction on quantum metrology. In this work, we study the QFI of thermal entanglement of two-qubit and three-qubit Heisenberg models with respect to SU(2) rotations. We show that even at high temperatures, DM interaction excites QFI of both ferromagnetic and antiferromagnetic models. We also show that QFI of the ferromagnetic model of two qubits can surpass the shot-noise limit of the separable states, while QFI of the antiferromagnetic model in consideration can only approach to the shot-noise limit. Our results open new insights in quantum metrology with Heisenberg models.

  13. Metrological Traceability in the Social Sciences: A Model from Reading Measurement

    Science.gov (United States)

    Stenner, A. Jackson; Fisher, William P., Jr.

    2013-09-01

    The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia.

  14. Coordinate metrology of a primary surface composite panel from the Large Millimeter Telescope

    Science.gov (United States)

    Gale, David M.; Lucero Álvarez, Maribel; Cabrera Cuevas, Lizeth; Leon-Huerta, Andrea; Arizmendi Reyes, Edgar; Icasio Hernández, Octavio; Castro Santos, David; Hernández Ríos, Emilio; Tecuapetla Sosa, Esteban; Tzile Torres, Carlos; Viliesid Alonso, Miguel

    2016-07-01

    The Large Millimeter Telescope (LMT) is a single-dish fully-steerable radio telescope presently operating with a 32.5 m parabolic primary reflector, in the process of extension to 50 m. The project is managed by the Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE) in México, and the University of Massachusetts Amherst, USA. A laminated surface panel from the LMT primary reflector has been subjected to a surface measurement assay at Mexico's National Metrology Center (CENAM). Data obtained using a coordinate measuring machine and laser tracker owned by CENAM is compared with measurements using an identical model laser tracker and the photogrammetry technique, the latter systems owned and operated by the LMT. All measurements were performed within the controlled metrology environment at CENAM. The measurement exercise is intended to prepare the groundwork for converting this spare surface panel into a calibrated work-piece. The establishment of a calibrated work-piece provides quality assurance for metrology through measurement traceability. It also simplifies the evaluation of measurement uncertainty for coordinate metrology procedures used by the LMT project during reflector surface qualification.

  15. Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy.

    Science.gov (United States)

    Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal

    2016-05-01

    X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or "tophat" beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

  16. Signal processing for order 10 pm accuracy displacement metrology in real-world scientific applications

    Science.gov (United States)

    Halverson, Peter G.; Loya, Frank M.

    2004-01-01

    This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

  17. Cryogenic current comparators with optimum SQUID readout for current and resistance quantum metrology

    NARCIS (Netherlands)

    Bartolomé Porcar, María Elena

    2002-01-01

    This thesis describes the development of several systems based on the Cryogenic Current Comparator with optimum SQUID readout, for current and resistance metrology applications. the CCC-SQUID is at present the most accurate current comparator available. A (type I) CCC consists basically of a

  18. Establishing metrological traceability for radiometric calibration of earth observation sensor in Malaysia

    Science.gov (United States)

    Ng, S. W.; Zulkifli, A.

    2016-10-01

    The space borne earth observation (EO) sensor provides a continuous large spatial coverage over the earth at relatively low cost (cost-effective) and can be practically accessible worldwide. The daily synoptic view offered by instrument in earth orbit is tremendously useful in various applications, particularly long term global monitoring that needs multi-disciplinary, multi-temporal and multi-sensor data. Due to the indirect measurement nature of the EO sensor, calibration and validation (cal/val) are essentially required to establish the linkage between the acquired raw data and the actual target of interest. Ultimately, EO sensor provider must strive to deliver “the right information, at the right time, to the right people”. This paper is authored with the main aim to report the process of establishing metrological traceability for radiometric calibration of EO sensor at Optical Calibration Laboratory (OCL), National Space Agency of Malaysia (ANGKASA). The paper is structured into six sections. The first section introduces the context of EO and background of radiometric calibration. The next section discusses the requirements for metrological traceability in radiometric calibration while the following third section outlines ANGKASA efforts in setting up the metrological traceability laboratory in radiometric calibration. Meanwhile, the uncertainty estimation results is reported in the fourth section and the fifth section explains some of the continuous efforts made in order to improve the current metrological traceability set up. Lastly, the summary of this paper is provided in the last section.

  19. What metrology can do to improve the quality of your atmospheric ammonia measurements

    Science.gov (United States)

    Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

    2017-04-01

    Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements, namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures, as well as in the infrastructure to attain metrological traceability, i.e. that the results of measurements are traceable to SI-units through an unbroken chain of calibrations. In the framework of the European Metrology Research Programme (EMRP) project on the topic "Metrology for Ammonia in Ambient Air" (MetNH3), European national metrology institutes (NMI's) have joined to tackle the issue of generating SI-traceable reference material, i.e. generate reference gas mixtures containing known amount fractions of NH3.This requires special infrastructure and analytical techniques: Measurements of ambient ammonia are commonly carried out with diffusive samplers or by active sampling with denuders, but such techniques have not yet been extensively validated. Improvements in the metrological traceability may be achieved through the determination of NH3 diffusive sampling rates using ammonia Primary Standard Gas Mixtures (PSMs), developed by gravimetry at the National Physical Laboratory NPL and a controlled atmosphere test facility in combination with on-line monitoring with a cavity ring-down spectrometer. The Federal Institute of Metrology METAS has developed an infrastructure to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol (atmospheric concentrations) and with uncertainties UNH3 filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field

  20. Pragmatic Software Innovation

    DEFF Research Database (Denmark)

    Aaen, Ivan; Jensen, Rikke Hagensby

    2014-01-01

    We understand software innovation as concerned with introducing innovation into the development of software intensive systems, i.e. systems in which software development and/or integration are dominant considerations. Innovation is key in almost any strategy for competitiveness in existing markets......, for creating new markets, or for curbing rising public expenses, and software intensive systems are core elements in most such strategies. Software innovation therefore is vital for about every sector of the economy. Changes in software technologies over the last decades have opened up for experimentation......, learning, and flexibility in ongoing software projects, but how can this change be used to facilitate software innovation? How can a team systematically identify and pursue opportunities to create added value in ongoing projects? In this paper, we describe Deweyan pragmatism as the philosophical foundation...

  1. Software Engineering Improvement Plan

    Science.gov (United States)

    2006-01-01

    In performance of this task order, bd Systems personnel provided support to the Flight Software Branch and the Software Working Group through multiple tasks related to software engineering improvement and to activities of the independent Technical Authority (iTA) Discipline Technical Warrant Holder (DTWH) for software engineering. To ensure that the products, comments, and recommendations complied with customer requirements and the statement of work, bd Systems personnel maintained close coordination with the customer. These personnel performed work in areas such as update of agency requirements and directives database, software effort estimation, software problem reports, a web-based process asset library, miscellaneous documentation review, software system requirements, issue tracking software survey, systems engineering NPR, and project-related reviews. This report contains a summary of the work performed and the accomplishments in each of these areas.

  2. Paladin Software Support Lab

    Data.gov (United States)

    Federal Laboratory Consortium — The Paladin Software Support Environment (SSE) occupies 2,241 square-feet. It contains the hardware and software tools required to support the Paladin Automatic Fire...

  3. ATLAS software packaging

    CERN Document Server

    Rybkin, G

    2012-01-01

    Software packaging is indispensable part of build and prerequisite for deployment processes. Full ATLAS software stack consists of TDAQ, HLT, and Offline software. These software groups depend on some 80 external software packages. We present tools, package PackDist, developed and used to package all this software except for TDAQ project. PackDist is based on and driven by CMT, ATLAS software configuration and build tool, and consists of shell and Python scripts. The packaging unit used is CMT project. Each CMT project is packaged as several packages - platform dependent (one per platform available), source code excluding header files, other platform independent files, documentation, and debug information packages (the last two being built optionally). Packaging can be done recursively to package all the dependencies. The whole set of packages for one software release, distribution kit, also includes configuration packages and contains some 120 packages for one platform. Also packaged are physics analysis pro...

  4. Commercial Data Mining Software

    Science.gov (United States)

    Zhang, Qingyu; Segall, Richard S.

    This chapter discusses selected commercial software for data mining, supercomputing data mining, text mining, and web mining. The selected software are compared with their features and also applied to available data sets. The software for data mining are SAS Enterprise Miner, Megaputer PolyAnalyst 5.0, PASW (formerly SPSS Clementine), IBM Intelligent Miner, and BioDiscovery GeneSight. The software for supercomputing are Avizo by Visualization Science Group and JMP Genomics from SAS Institute. The software for text mining are SAS Text Miner and Megaputer PolyAnalyst 5.0. The software for web mining are Megaputer PolyAnalyst and SPSS Clementine . Background on related literature and software are presented. Screen shots of each of the selected software are presented, as are conclusions and future directions.

  5. Software Testing Requires Variability

    DEFF Research Database (Denmark)

    Christensen, Henrik Bærbak

    2003-01-01

    Software variability is the ability of a software system or artefact to be changed, customized or configured for use in a particular context. Variability in software systems is important from a number of perspectives. Some perspectives rightly receive much attention due to their direct economic...... impact in software production. As is also apparent from the call for papers these perspectives focus on qualities such as reuse, adaptability, and maintainability....

  6. Software engineer's pocket book

    CERN Document Server

    Tooley, Michael

    2013-01-01

    Software Engineer's Pocket Book provides a concise discussion on various aspects of software engineering. The book is comprised of six chapters that tackle various areas of concerns in software engineering. Chapter 1 discusses software development, and Chapter 2 covers programming languages. Chapter 3 deals with operating systems. The book also tackles discrete mathematics and numerical computation. Data structures and algorithms are also explained. The text will be of great use to individuals involved in the specification, design, development, implementation, testing, maintenance, and qualit

  7. Software Testing Requires Variability

    DEFF Research Database (Denmark)

    Christensen, Henrik Bærbak

    2003-01-01

    Software variability is the ability of a software system or artefact to be changed, customized or configured for use in a particular context. Variability in software systems is important from a number of perspectives. Some perspectives rightly receive much attention due to their direct economic...... impact in software production. As is also apparent from the call for papers these perspectives focus on qualities such as reuse, adaptability, and maintainability....

  8. Software engineering measurement

    CERN Document Server

    Munson, PhD, John C

    2003-01-01

    By demonstrating how to develop simple experiments for the empirical validation of theoretical research and showing how to convert measurement data into meaningful and valuable information, this text fosters more precise use of software measurement in the computer science and software engineering literature. Software Engineering Measurement shows you how to convert your measurement data to valuable information that can be used immediately for software process improvement.

  9. Whispering gallery mode resonators for frequency metrology applications

    Science.gov (United States)

    Baumgartel, Lukas

    This dissertation describes an investigation into the use of whispering gallery mode (WGM) resonators for applications towards frequency reference and metrology. Laser stabilization and the measurement of optical frequencies have enabled myriad technologies of both academic and commercial interest. A technology which seems to span both motivations is optical atomic clocks. These devices are virtually unimaginable without the ultra stable lasers plus frequency measurement and down-conversion afforded by Fabry Perot (FP) cavities and model-locked laser combs, respectively. However, WGM resonators can potentially perform both of these tasks while having the distinct advantages of compactness and simplicity. This work represents progress towards understanding and mitigating the performance limitations of WGM cavities for such applications. A system for laser frequency stabilization to a the cavity via the Pound-Drever-Hall (PDH) method is described. While the laser lock itself is found to perform at the level of several parts in 1015, a variety of fundamental and technical mechanisms destabilize the WGM frequency itself. Owing to the relatively large thermal expansion coefficients in optical crystals, environmental temperature drifts set the stability limit at time scales greater than the thermal relaxation time of the crystal. Uncompensated, these drifts pull WGM frequencies about 3 orders of magnitude more than they would in an FP cavity. Thus, two temperature compensation schemes are developed. An active scheme measures and stabilizes the mode volume temperature to the level of several nK, reducing the effective temperature coefficient of the resonator to 1.7x10-7 K-1; simulations suggest that the value could eventually be as low as 3.5x10-8 K-1, on par with the aforementioned FP cavities. A second, passive scheme is also described, which employs a heterogeneous resonator structure that capitalizes on the thermo-mechanical properties of one material and the optical

  10. DualBeam metrology: a new technique for optimizing 0.13-um photo processes

    Science.gov (United States)

    Berger, Steven D.; Desloge, Denis; Virgalla, Robert J.; Davis, Todd; Paxton, Ted A.; Witko, David

    2001-08-01

    A DualBeam Metrology system was investigated for the application of obtaining 3-dimensional (3D) characterization of a 130 nm ground rule KrF photolithography process. Integrated circuit devices are 3-dimensional in structure and, hence, should be best characterized using 3-dimensional techniques to ensure adherence to the design architecture and the desired process window for manufacturing. The need for 3D metrology is further required for the characterization and monitoring of critical layer processes and equipment performance. The metrology used in this investigation is a novel technique for critical feature cross sectioning. The process for DualBeam metrology uses a focused ion beam (FIB) for milling or cutting the cross section through the photoresist or process film. An integrated scanning electron microscope (SEM) provides high-resolution imaging of the features, and a flexible automated metrology package collects and analyzes the data. To demonstrate the feasibility of the technique, critical dimension (CD) data and sidewall angle (SWA) measurements were captured from 130 nm lines and 150 nm contacts at 1:1 densities. The critical criteria for the characterization of the photolithography process window are CD control, depth of focus (DOF), exposure latitude, and feature sidewall angle or profile. Using the DualBeam technique, 2D and 3D data are captured on a single machine platform using a cut, look, and measure routine. A further benefit is the availability of high-resolution cross-sectional SEM images that can be used qualitatively to validate the quantitative data. The results presented here show the performance of this 130 nm ground rule process and the benefits of utilizing this efficient characterization technique.

  11. Applications of on-product diffraction-based focus metrology in logic high volume manufacturing

    Science.gov (United States)

    Noyes, Ben F.; Mokaberi, Babak; Bolton, David; Li, Chen; Palande, Ashwin; Park, Kevin; Noot, Marc; Kea, Marc

    2016-03-01

    The integration of on-product diffraction-based focus (DBF) capability into the majority of immersion lithography layers in leading edge logic manufacturing has enabled new applications targeted towards improving cycle time and yield. A CD-based detection method is the process of record (POR) for excursion detection. The drawback of this method is increased cycle time and limited sampling due to CD-SEM metrology capacity constraints. The DBFbased method allows the addition of focus metrology samples to the existing overlay measurements on the integrated metrology (IM) system. The result enables the addition of measured focus to the SPC system, allowing a faster excursion detection method. For focus targeting, the current method involves using a dedicated focus-exposure matrix (FEM) on all scanners, resulting in lengthy analysis times and uncertainty in the best focus. The DBF method allows the measurement to occur on the IM system, on a regular production wafer, and at the same time as the exposure. This results in a cycle time gain as well as a less subjective determination of best focus. A third application aims to use the novel onproduct focus metrology data in order to apply per-exposure focus corrections to the scanner. These corrections are particularly effective at the edge of the wafer, where systematic layer-dependent effects can be removed using DBFbased scanner feedback. This paper will discuss the development of a methodology to accomplish each of these applications in a high-volume production environment. The new focus metrology method, sampling schemes, feedback mechanisms and analysis methods lead to improved focus control, as well as earlier detection of failures.

  12. Metrology requirements for the serial production of ELT primary mirror segments

    Science.gov (United States)

    Rees, Paul C. T.; Gray, Caroline

    2015-08-01

    The manufacture of the next generation of large astronomical telescopes, the extremely large telescopes (ELT), requires the rapid manufacture of greater than 500 1.44m hexagonal segments for the primary mirror of each telescope. Both leading projects, the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT), have set highly demanding technical requirements for each fabricated segment. These technical requirements, when combined with the anticipated construction schedule for each telescope, suggest that more than one optical fabricator will be involved in the delivery of the primary mirror segments in order to meet the project schedule. For one supplier, the technical specification is challenging and requires highly consistent control of metrology in close coordination with the polishing technologies used in order to optimize production rates. For production using multiple suppliers, however the supply chain is structured, consistent control of metrology along the supply chain will be required. This requires a broader pattern of independent verification than is the case of a single supplier. This paper outlines the metrology requirements for a single supplier throughout all stages of the fabrication process. We identify and outline those areas where metrology accuracy and duration have a significant impact on production efficiency. We use the challenging ESO E-ELT technical specification as an example of our treatment, including actual process data. We further develop this model for the case of a supply chain consisting of multiple suppliers. Here, we emphasize the need to control metrology throughout the supply chain in order to optimize net production efficiency.

  13. Software variability management

    NARCIS (Netherlands)

    Bosch, J; Nord, RL

    2004-01-01

    During recent years, the amount of variability that has to be supported by a software artefact is growing considerably and its management is evolving into a major challenge during development, usage, and evolution of software artefacts. Successful management of variability in software leads to

  14. Software Language Evolution

    NARCIS (Netherlands)

    Vermolen, S.D.

    2012-01-01

    Software plays a critical role in our daily life. Vast amounts of money are spent on more and more complex systems. All software, regardless if it controls a plane or the game on your phone is never finished. Software changes when it contains bugs or when new functionality is added. This process of

  15. Software Architecture Evolution

    Science.gov (United States)

    Barnes, Jeffrey M.

    2013-01-01

    Many software systems eventually undergo changes to their basic architectural structure. Such changes may be prompted by new feature requests, new quality attribute requirements, changing technology, or other reasons. Whatever the causes, architecture evolution is commonplace in real-world software projects. Today's software architects, however,…

  16. Java for flight software

    Science.gov (United States)

    Benowitz, E.; Niessner, A.

    2003-01-01

    This work involves developing representative mission-critical spacecraft software using the Real-Time Specification for Java (RTSJ). This work currently leverages actual flight software used in the design of actual flight software in the NASA's Deep Space 1 (DSI), which flew in 1998.

  17. Software Language Evolution

    NARCIS (Netherlands)

    Vermolen, S.D.

    2012-01-01

    Software plays a critical role in our daily life. Vast amounts of money are spent on more and more complex systems. All software, regardless if it controls a plane or the game on your phone is never finished. Software changes when it contains bugs or when new functionality is added. This process of

  18. Software Engineering for Portability.

    Science.gov (United States)

    Stanchev, Ivan

    1990-01-01

    Discussion of the portability of educational software focuses on the software design and development process. Topics discussed include levels of portability; the user-computer dialog; software engineering principles; design techniques for student performance records; techniques of courseware programing; and suggestions for further research and…

  19. Software Architecture Evolution

    Science.gov (United States)

    Barnes, Jeffrey M.

    2013-01-01

    Many software systems eventually undergo changes to their basic architectural structure. Such changes may be prompted by new feature requests, new quality attribute requirements, changing technology, or other reasons. Whatever the causes, architecture evolution is commonplace in real-world software projects. Today's software architects, however,…

  20. Software Maintenance Success Recipes

    CERN Document Server

    Reifer, Donald J

    2011-01-01

    Dispelling much of the folklore surrounding software maintenance, Software Maintenance Success Recipes identifies actionable formulas for success based on in-depth analysis of more than 200 real-world maintenance projects. It details the set of factors that are usually present when effective software maintenance teams do their work and instructs on the methods required to achieve success. Donald J. Reifer--an award winner for his contributions to the field of software engineering and whose experience includes managing the DoD Software Initiatives Office--provides step-by-step guidance on how t