WorldWideScience

Sample records for crystalline silicon c-si

  1. Effect of the CO2/SiH4 Ratio in the p-[mu]c-SiO:H Emitter Layer on the Performance of Crystalline Silicon Heterojunction Solar Cells

    National Research Council Canada - National Science Library

    Jaran Sritharathikhun; Taweewat Krajangsang; Apichan Moollakorn; Sorapong Inthisang; Amornrat Limmanee; Aswin Hongsingtong; Nattaphong Boriraksantikul; Tianchai Taratiwat; Nirod Akarapanjavit; Kobsak Sriprapha

    2014-01-01

    .... The reported work focused on the effects of the CO2/SiH4 ratio on the properties of p-μ c-SiO:H films and the effectiveness of the films as an emitter layer of crystalline silicon heterojunction (c-Si-HJ) solar cells. A p-μ c...

  2. Photo-induced density-of-states variation measured by DLTS method in intrinsic micro-crystalline silicon (i-μc-Si:H) films

    Science.gov (United States)

    Wang, J.; Sun, Q. S.; Liu, H. N.; He, Y. L.

    1987-06-01

    This paper advances a measurement and two calculations of a high-frequency DLTS method for the density-of-states g(E) of intrinsic micro-crystalline and amorphous silicon film. The method surmounts the difficulties of DLTS measurement of i-a-Si:H or i-μc-Si:H samples and applies the common high-frequency DLTS to it, while the temperature of measurement is extended below 77K. Following the method, we successfully observed the obvious increase of density-of-states produced by illumination.

  3. Variation in the Optical Properties of the SiC-SiO2 Composite Antireflection Layer in Crystalline Silicon Solar Cells by Annealing

    Science.gov (United States)

    Jannat, Azmira; Li, Zhen Yu; Akhter, M. Shaheer; Yang, O.-Bong

    2017-07-01

    This study showed the effects of annealing on a sol-gel-derived SiC-SiO2 composite antireflection (AR) layer and investigated the optical and photovoltaic properties of crystalline silicon (Si) solar cells. The SiC-SiO2 composite AR coating showed a considerable decrease in reflectance from 7.18% to 3.23% at varying annealing temperatures of 450-800°C. The refractive indices of the SiC-SiO2 composite AR layer were tuned from 2.06 to 2.45 with the increase in annealing temperature. The analysis of the current density-voltage characteristics indicated that the energy conversion efficiencies of the fabricated Si solar cells gradually increased from 16.99% to 17.73% with increasing annealing temperatures of 450-800°C. The annealing of the SiC-SiO2 composite AR layer in Si solar cells was crucial to improving the optical, morphological, and photovoltaic properties.

  4. Decoupling crystalline volume fraction and V{sub OC} in microcrystalline silicon pin solar cells by using a {mu}c-Si:F:H intrinsic layer

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Q.; Johnson, E.V.; Djeridane, Y.; Abramov, A.; Roca i Cabarrocas, P. [LPICM-CNRS, Ecole Polytechnique, Palaiseau (France)

    2008-08-15

    Microcrystalline silicon thin film pin solar cells with a highly crystallized intrinsic {mu}c-Si:F:H absorber were prepared by RF-plasma enhanced chemical vapour deposition using SiF{sub 4} as the gas precursor. The cells were produced with a vacuum break between the doped layer and intrinsic layer depositions, and the effect of different subsequent interface treatment processes was studied. The use of an intrinsic {mu}c-Si:H p/i buffer layer before the first air break increased the short circuit current density from 22.3 mA/cm{sup 2} to 24.7 mA/cm{sup 2}. However, the use of a hydrogen-plasma treatment after both air breaks without an interface buffer layer improved both the open circuit voltage and the fill factor. Although the material used for the absorber layer showed a very high crystalline fraction and thus an increased spectral response at long wavelengths, an open-circuit voltage (V{sub OC}) of 0.523 V was nevertheless observed. Such a value of V{sub OC} is higher than is typically obtained in devices that employ a highly crystallized absorber as reported in the literature (see abstract figure). Using a hydrogen-plasma treatment, a single junction {mu}c-Si:F:H pin solar cell with an efficiency of 8.3% was achieved. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  5. Band edge discontinuities and carrier transport in c-Si/porous silicon heterojunctions

    Energy Technology Data Exchange (ETDEWEB)

    Islam, Md Nazrul [QAED-SRG, Space Applications Centre (ISRO), Ahmedabad - 380015 (India); Ram, Sanjay K [Department of Physics, Indian Institute of Technology, Kanpur - 208016 (India); Kumar, Satyendra [Department of Physics, Indian Institute of Technology, Kanpur - 208016 (India)

    2007-10-07

    We have prepared light emitting nanocrystallline porous silicon (PS) layers by electrochemical anodization of crystalline silicon (c-Si) wafer and characterized the c-Si/PS heterojunctions using temperature dependence of dark current-voltage (I-V) characteristics. The reverse bias I-V characteristics of c-Si/PS heterojunctions are found to behave like the Schottky junctions where carrier transport is mainly governed by the carrier generation-recombination in the depletion region formed on the PS side. Fermi level of c-Si gets pinned to the defect levels at the interface resulting in ln(I) {approx} V{sup 1/2}. The barrier height in the reverse bias condition is shown to be equal to the band offset at the conduction band edges. An energy band diagram for the c-Si/PS heterojunction is proposed.

  6. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    Energy Technology Data Exchange (ETDEWEB)

    Wan, Yimao, E-mail: yimao.wan@anu.edu.au; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres [Research School of Engineering, The Australian National University, Canberra, Australian Capital Territory 0200 (Australia)

    2015-12-07

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiN{sub x}) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiN{sub x} stack, recombination current density J{sub 0} values of 9, 11, 47, and 87 fA/cm{sup 2} are obtained on 10 Ω·cm n-type, 0.8 Ω·cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J{sub 0} on n-type 10 Ω·cm wafers is further reduced to 2.5 ± 0.5 fA/cm{sup 2} when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiN{sub x} stack is thermally stable at 400 °C in N{sub 2} for 60 min on all four c-Si surfaces. Capacitance–voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiN{sub x} stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  7. Crystalline-silicon photovoltaics: Necessary and sufficient

    Science.gov (United States)

    Basore, P. A.; Gee, J. M.

    Photovoltaic (PV) energy systems have always been dominated by crystalline-silicon (c-Si) technology, and recent developments persuasively suggest that c-Si will continue to be the dominant technology well into the next century. The authors explain why c-Si technology is fairing much better than previously expected, and discuss the impact of improvements currently under development. They use a ground-up, engineering-based approach to predict the expected evolution of this type of PV system, and argue that c-Si PV will be in a position to compete for the US residential power market starting in about the year 2010. This market alone will provide the opportunity for PV to supply several percent of the electrical energy used in the United States. Crystalline-silicon technology is therefore not just necessary for building a near-term PV industry; it also offers a low-risk approach to meeting long-term goals for PV energy systems.

  8. SIMILAR POINT-DEFECTS IN CRYSTALLINE AND AMORPHOUS-SILICON

    NARCIS (Netherlands)

    LIANG, ZN; NIESEN, L; VANDENHOVEN, GN; CUSTER, JS

    1994-01-01

    The microscopic nature of defects in ion-implanted crystalline silicon (c-Si) and amorphous silicon (a-Si) has been studied using Mossbauer spectroscopy. The evolution of the local structure around the probe atoms is followed during thermal annealing of ion-beam-created amorphous and ion-beam-damage

  9. High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; van Sark, W.G.J.H.M.; Rath, J.K.

    2011-01-01

    We investigate the influence of thermal annealing on the passivation quality of crystalline silicon (c-Si) surfaces by intrinsic and n-type hydrogenated amorphous silicon (a-Si:H) films. For temperatures up to 255 C, we find an increase in surface passivation quality, corresponding to a decreased da

  10. Temperature dependence of pin solar cell parameters with intrinsic layers made of pm-Si:H and low crystalline volume fraction {mu}c-Si:H

    Energy Technology Data Exchange (ETDEWEB)

    Hamadeh, H. [AECS, Physics Department, P.O. Box 6091, Damascus (Syria)

    2010-07-15

    A comparison of the temperature dependence of the IV characteristics parameters of hydrogenated silicon pin solar cells with intrinsic layers made of polymorphous silicon (pm-Si:H) and of {mu}c-Si:H with low crystalline volume fraction has been performed. When using pm-Si:H, higher efficiency and higher filling factors are achieved over a wide temperature range. Diode quality factors of both types of cells show similar temperature dependence. Recombination processes over the whole intrinsic layer dominates the forward current. A change of the cell parameters under illumination is also observed. The transport mechanism of both cells is similar in the temperature range that is important for most applications. Due to its optical and transport properties, pm-Si:H poses a very interesting alternative to {mu}c-Si:H and a-Si:H in the temperature range of normal terrestrial applications. (author)

  11. Structural investigation of the amorphous/crystalline interface by means of quantitative high-resolution transmission electron microscopy on the systems a-Si/c-Si and a-Ge/c-Si; Strukturelle Untersuchung der amorph/kristallinen Grenzflaeche mittels quantitativer hochaufloesender Transmissionselektronenmikroskopie an den Systemen a-Si/c-Si und a-Ge/c-Si

    Energy Technology Data Exchange (ETDEWEB)

    Thiel, K.

    2006-11-02

    In this Thesis the interfaces between covalently bonded crystalline and amorphous materials were studied with regard to the induced ordering in the amorphous material in the interfacial region by means of high-resolution transmission electron microscopy (HREM). The interface between amorphous germanium and crystalline silicon and the interface between amorphous and crystalline silicon served as material system. In order to quantify the influence of the crystalline order on the amorphous material, the HREM images were periodically averaged along the interface. The intensity components, which are correlated with the period of the lattice image, could thus be separated from the statistical intensity fluctuations, which are characteristic for images of amorphous materials. Since amorphous materials can only be described meaningful by statistical distribution functions, for the induced order a three-dimensional distribution function {rho}{sub 3D}(r) was taken as a basis, which describes the probability to find an atom in the amorphous material, if r=0 is the position of an atom in the crystal. Its two-dimensional projection, {rho}, can be determined using iterative image matching techniques on averaged experimental and simulated interface images. For the analyzed material systems {rho} exhibits lateral ordering as well as a pronounced layering in the vicinity of the interface. In the case of the a-Si/c-Si sample the mean orientation of bonds was 70.5 , as is in the case of the undistorted diamond lattice, while for the a-Ge/c-Si sample 65 resulted. The standard deviation for the distribution of the deviations from the mean bond angle yields for the a-Ge/c-Si sample in the first atomic layer a value of 11.3 and for the a-Si/c-Si sample 1.9 . These results suggest the conclusion, that the differences in these values are to be interpreted as the reaction of the amorphous material to the volume misfit. Although for both material systems 1.4 nm was calculated for the width

  12. Single crystalline mesoporous silicon nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Hochbaum, Allon; Dargas, Daniel; Hwang, Yun Jeong; Yang, Peidong

    2009-08-18

    Herein we demonstrate a novel electroless etching synthesis of monolithic, single-crystalline, mesoporous silicon nanowire arrays with a high surface area and luminescent properties consistent with conventional porous silicon materials. The photoluminescence of these nanowires suggest they are composed of crystalline silicon with small enough dimensions such that these arrays may be useful as photocatalytic substrates or active components of nanoscale optoelectronic devices. A better understanding of this electroless route to mesoporous silicon could lead to facile and general syntheses of different narrow bandgap semiconductor nanostructures for various applications.

  13. Inexpensive transparent nanoelectrode for crystalline silicon solar cells.

    Science.gov (United States)

    Peng, Qiang; Pei, Ke; Han, Bing; Li, Ruopeng; Zhou, Guofu; Liu, Jun-Ming; Kempa, Krzysztof; Gao, Jinwei

    2016-12-01

    We report an easily manufacturable and inexpensive transparent conductive electrode for crystalline silicon (c-Si) solar cells. It is based on a silver nanoparticle network self-forming in the valleys between the pyramids of a textured solar cell surface, transformed into a nanowire network by sintering, and subsequently "buried" under the silicon surface by a metal-assisted chemical etching. We have successfully incorporated these steps into the conventional c-Si solar cell manufacturing process, from which we have eliminated the expensive screen printing and firing steps, typically used to make the macro-electrode of conducting silver fingers. The resulting, preliminary solar cell achieved power conversion efficiency only 14 % less than the conventionally processed c-Si control cell. We expect that a cell with an optimized processing will achieve at least efficiency of the conventional commercial cell, but at significantly reduced manufacturing cost.

  14. Inexpensive transparent nanoelectrode for crystalline silicon solar cells

    Science.gov (United States)

    Peng, Qiang; Pei, Ke; Han, Bing; Li, Ruopeng; Zhou, Guofu; Liu, Jun-Ming; Kempa, Krzysztof; Gao, Jinwei

    2016-06-01

    We report an easily manufacturable and inexpensive transparent conductive electrode for crystalline silicon (c-Si) solar cells. It is based on a silver nanoparticle network self-forming in the valleys between the pyramids of a textured solar cell surface, transformed into a nanowire network by sintering, and subsequently "buried" under the silicon surface by a metal-assisted chemical etching. We have successfully incorporated these steps into the conventional c-Si solar cell manufacturing process, from which we have eliminated the expensive screen printing and firing steps, typically used to make the macro-electrode of conducting silver fingers. The resulting, preliminary solar cell achieved power conversion efficiency only 14 % less than the conventionally processed c-Si control cell. We expect that a cell with an optimized processing will achieve at least efficiency of the conventional commercial cell, but at significantly reduced manufacturing cost.

  15. Single crystalline mesoporous silicon nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Hochbaum, A.I.; Gargas, Daniel; Jeong Hwang, Yun; Yang, Peidong

    2009-08-04

    Herein we demonstrate a novel electroless etching synthesis of monolithic, single-crystalline, mesoporous silicon nanowire arrays with a high surface area and luminescent properties consistent with conventional porous silicon materials. These porous nanowires also retain the crystallographic orientation of the wafer from which they are etched. Electron microscopy and diffraction confirm their single-crystallinity and reveal the silicon surrounding the pores is as thin as several nanometers. Confocal fluorescence microscopy showed that the photoluminescence (PL) of these arrays emanate from the nanowires themselves, and their PL spectrum suggests that these arrays may be useful as photocatalytic substrates or active components of nanoscale optoelectronic devices.

  16. Observation by conductive-probe atomic force microscopy of strongly inverted surface layers at the hydrogenated amorphous silicon/crystalline silicon heterojunctions

    Science.gov (United States)

    Maslova, O. A.; Alvarez, J.; Gushina, E. V.; Favre, W.; Gueunier-Farret, M. E.; Gudovskikh, A. S.; Ankudinov, A. V.; Terukov, E. I.; Kleider, J. P.

    2010-12-01

    Heterojunctions made of hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si) are examined by conducting probe atomic force microscopy. Conductive channels at both (n )a-Si:H/(p)c-Si and (p)a-Si:H/(n)c-Si interfaces are clearly revealed. These are attributed to two-dimension electron and hole gases due to strong inversion layers at the c-Si surface in agreement with previous planar conductance measurements. The presence of a hole gas in (p )a-Si:H/(n)c-Si structures implies a quite large valence band offset (EVc-Si-EVa-Si:H>0.25 eV).

  17. Impact of microcrystalline silicon carbide growth using hot-wire chemical vapor deposition on crystalline silicon surface passivation

    Energy Technology Data Exchange (ETDEWEB)

    Pomaska, M., E-mail: m.pomaksa@fz-juelich.de [Forschungszentrum Jülich, IEK5-Photovoltaics, Wilhelm-Johnen-Strasse, 52425 Jülich (Germany); Beyer, W. [Helmholtz-Zentrum Berlin für Materialien und Energie, Silicon Photovoltaics, Kekuléstrasse 5, 12489 Berlin (Germany); Neumann, E. [Forschungszentrum Jülich, PGI-8-PT, Wilhelm-Johnen-Strasse, 52425 Jülich (Germany); Finger, F.; Ding, K. [Forschungszentrum Jülich, IEK5-Photovoltaics, Wilhelm-Johnen-Strasse, 52425 Jülich (Germany)

    2015-11-30

    Highly crystalline microcrystalline silicon carbide (μc-SiC:H) with excellent optoelectronic material properties is a promising candidate as highly transparent doped layer in silicon heterojunction (SHJ) solar cells. These high quality materials are usually produced using hot wire chemical vapor deposition under aggressive growth conditions giving rise to the removal of the underlying passivation layer and thus the deterioration of the crystalline silicon (c-Si) surface passivation. In this work, we introduced the n-type μc-SiC:H/n-type μc-SiO{sub x}:H/intrinsic a-SiO{sub x}:H stack as a front layer configuration for p-type SHJ solar cells with the μc-SiO{sub x}:H layer acting as an etch-resistant layer against the reactive deposition conditions during the μc-SiC:H growth. We observed that the unfavorable expansion of micro-voids at the c-Si interface due to the in-diffusion of hydrogen atoms through the layer stack might be responsible for the deterioration of surface passivation. Excellent lifetime values were achieved under deposition conditions which are needed to grow high quality μc-SiC:H layers for SHJ solar cells. - Highlights: • High surface passivation quality was preserved after μc-SiC:H deposition. • μc-SiC:H/μc-SiO{sub x}:H/a-SiO{sub x}:H stack a promising front layer configuration • Void expansion at a-SiO{sub x}:H/c-Si interface for deteriorated surface passivation • μc-SiC:H provides a high transparency and electrical conductivity.

  18. Properties of interfaces in amorphous/crystalline silicon heterojunctions

    Energy Technology Data Exchange (ETDEWEB)

    Olibet, Sara; Vallat-Sauvain, Evelyne; Fesquet, Luc; Damon-Lacoste, Jerome; De Wolf, Stefaan; Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), IMT, Photovoltaics and Thin Film Electronics Laboratory, Breguet 2, 2000 Neuchatel (Switzerland); Monachon, Christian; Hessler-Wyser, Aicha [Ecole Polytechnique Federale de Lausanne (EPFL), Interdisciplinary Centre for Electron Microscopy (CIME), 1015 Lausanne (Switzerland)

    2010-03-15

    To study recombination at the amorphous/crystalline Si (a-Si:H/c-Si) heterointerface, the amphoteric nature of silicon (Si) dangling bonds is taken into account. Modeling interface recombination measured on various test structures provides insight into the microscopic passivation mechanisms, yielding an excellent interface defect density reduction by intrinsic a-Si:H and tunable field-effect passivation by doped layers. The potential of this model's applicability to recombination at other Si heterointerfaces is demonstrated. Solar cell properties of a-Si:H/c-Si heterojunctions are in good accordance with the microscopic interface properties revealed by modeling, that are, e.g., slight asymmetries in the neutral capture cross-sections and band offsets. The importance of atomically abrupt interfaces and the difficulties to obtain them on pyramidally textured c-Si is studied in combination with transmission electron microscopy. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  19. Progress in the medicinal chemistry of silicon: C/Si exchange and beyond.

    Science.gov (United States)

    Fujii, Shinya; Hashimoto, Yuichi

    2017-04-01

    Application of silyl functionalities is one of the most promising strategies among various 'elements chemistry' approaches for the development of novel and distinctive drug candidates. Replacement of one or more carbon atoms of various biologically active compounds with silicon (so-called sila-substitution) has been intensively studied for decades, and is often effective for alteration of activity profile and improvement of metabolic profile. In addition to simple C/Si exchange, several novel approaches for utilizing silicon in medicinal chemistry have been suggested in recent years, focusing on the intrinsic differences between silicon and carbon. Sila-substitution offers great potential for enlarging the chemical space of medicinal chemistry, and provides many options for structural development of drug candidates.

  20. Formation of thin-film crystalline silicon on glass observed by in-situ XRD

    NARCIS (Netherlands)

    Westra, J.M.; Vavrunkova, V.; Sutta, P.; Van Swaaij, R.A.C.M.M.; Zeman, M.

    2010-01-01

    Thin-film poly-crystalline silicon (poly c-Si) on glass obtained by crystallization of an amorphous silicon (a-Si) film is a promising material for low cost, high efficiency solar cells. Our approach to obtain this material is to crystallize a-Si films on glass by solid phase crystallization (SPC).

  1. Characterization of heterojunctions in crystalline-silicon-based solar cells by internal photoemission

    Energy Technology Data Exchange (ETDEWEB)

    Sakata, Isao; Yamanaka, Mitsuyuki; Kawanami, Hitoshi [Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, AIST Central-2, Tsukuba, Ibaraki 305-8568 (Japan)

    2009-06-15

    Internal photoemission (IPE) has been successfully applied to evaluate band offsets of heterojunctions (HJs) in crystalline silicon (c-Si)-based solar cells. Tunneling of carriers through the potential spike at HJ and the presence of a carrier conduction path in the wide-band-gap material of HJ can affect the IPE results. In other words, IPE measures the effective band discontinuity, including effects of the carrier conduction path. This feature of IPE is suited for the characterization of solar-cell structures. Results obtained for hydrogenated amorphous silicon/c-Si HJ and gallium phosphide/c-Si HJ are presented and discussed. (author)

  2. a-Si:H/c-Si heterojunction front- and back contacts for silicon solar cells with p-type base

    Energy Technology Data Exchange (ETDEWEB)

    Rostan, Philipp Johannes

    2010-07-01

    This thesis reports on low temperature amorphous silicon back and front contacts for high-efficiency crystalline silicon solar cells with a p-type base. The back contact uses a sequence of intrinsic amorphous (i-a-Si:H) and boron doped microcrystalline (p-{mu}c-Si:H) silicon layers fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) and a magnetron sputtered ZnO:Al layer. The back contact is finished by evaporating Al onto the ZnO:Al and altogether prepared at a maximum temperature of 220 C. Analysis of the electronic transport of mobile charge carriers at the back contact shows that the two high-efficiency requirements low back contact series resistance and high quality c-Si surface passivation are in strong contradiction to each other, thus difficult to achieve at the same time. The preparation of resistance- and effective lifetime samples allows one to investigate both requirements independently. Analysis of the majority charge carrier transport on complete Al/ZnO:Al/a-Si:H/c-Si back contact structures derives the resistive properties. Measurements of the effective minority carrier lifetime on a-Si:H coated wafers determines the back contact surface passivation quality. Both high-efficiency solar cell requirements together are analyzed in complete photovoltaic devices where the back contact series resistance mainly affects the fill factor and the back contact passivation quality mainly affects the open circuit voltage. The best cell equipped with a diffused emitter with random texture and a full-area a-Si:H/c-Si back contact has an independently confirmed efficiency {eta} = 21.0 % with an open circuit voltage V{sub oc} = 681 mV and a fill factor FF = 78.7 % on an area of 1 cm{sup 2}. An alternative concept that uses a simplified a-Si:H layer sequence combined with Al-point contacts yields a confirmed efficiency {eta} = 19.3 % with an open circuit voltage V{sub oc} = 655 mV and a fill factor FF = 79.5 % on an area of 2 cm{sup 2}. Analysis of the

  3. Birefringence Measurements on Crystalline Silicon

    CERN Document Server

    Krüger, Christoph; Khalaidovski, Alexander; Steinlechner, Jessica; Nawrodt, Ronny; Schnabel, Roman; Lück, Harald

    2015-01-01

    Crystalline silicon has been proposed as a new test mass material in third generation gravitational wave detectors such as the Einstein Telescope (ET). Birefringence can reduce the interferometric contrast and can produce dynamical disturbances in interferometers. In this work we use the method of polarisation-dependent resonance frequency analysis of Fabry-Perot-cavities containing silicon as a birefringent medium. Our measurements show a birefringence of silicon along the (111) axis of the order of $\\Delta\\, n \\approx 10^{-7}$ at a laser wavelength of 1550nm and room temperature. A model is presented that explains the results of different settings of our measurements as a superposition of elastic strains caused by external stresses in the sample and plastic strains possibly generated during the production process. An application of our theory on the proposed ET test mass geometry suggests no critical effect on birefringence due to elastic strains.

  4. Optical and electrical characterization of crystalline silicon films formed by rapid thermal annealing of amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Baldus-Jeursen, Christopher, E-mail: cjbaldus@uwaterloo.ca; Tarighat, Roohollah Samadzadeh, E-mail: rsamadza@uwaterloo.ca; Sivoththaman, Siva, E-mail: sivoththaman@uwaterloo.ca

    2016-03-31

    The effect of rapid thermal annealing (RTA) on n-type hydrogenated amorphous silicon (a-Si:H) films deposited on single-crystal silicon (c-Si) wafers was studied by electrical and optical methods. Deposition of a-Si:H films by plasma-enhanced chemical vapor deposition (PECVD) was optimized for high deposition rate and maximum film uniformity. RTA processed films were characterized by spreading resistance profiling (SRP), Hall effect, spectroscopic ellipsometry, defect etching, and transmission electron microscopy (TEM). It was found that the films processed between 600 °C and 1000 °C were highly crystalline and that the defect density in the films diminished with increasing thermal budget. Junctions formed by the RTA processed n-type a-Si:H films on p-type c-Si wafers were tested for device applicability. It was established that these films can be used as the emitter layer in n{sup +}p photovoltaic (PV) devices with over 14% conversion efficiency. - Highlights: • Rapid thermal annealing of doped amorphous silicon deposited on single-crystal silicon (c-Si) wafers resulted in highly crystalline films for photovoltaic devices. • As the annealing temperature increased, the electrical and optical properties of the films became increasingly similar to single-crystal silicon. • Annealing temperatures between 500-1000 oC were investigated. Solar cell devices fabricated after annealing at 750 oC were found to be the most suitable compromise between good quality crystalline films and minimal dopant diffusion into the c-Si wafer. • Annealed films were highly conductive without the need for a transparent conducting oxide.

  5. Amorphous silicon crystalline silicon heterojunction solar cells

    CERN Document Server

    Fahrner, Wolfgang Rainer

    2013-01-01

    Amorphous Silicon/Crystalline Silicon Solar Cells deals with some typical properties of heterojunction solar cells, such as their history, the properties and the challenges of the cells, some important measurement tools, some simulation programs and a brief survey of the state of the art, aiming to provide an initial framework in this field and serve as a ready reference for all those interested in the subject. This book helps to "fill in the blanks" on heterojunction solar cells. Readers will receive a comprehensive overview of the principles, structures, processing techniques and the current developmental states of the devices. Prof. Dr. Wolfgang R. Fahrner is a professor at the University of Hagen, Germany and Nanchang University, China.

  6. Trace elements study of high purity nanocrystalline silicon carbide (3C-SiC) using k0-INAA method

    Science.gov (United States)

    Huseynov, Elchin; Jazbec, Anze

    2017-07-01

    Silicon carbide (3C-SiC) nanoparticles have been irradiated by neutron flux (2×1013 n·cm-2·s-1) at TRIGA Mark II type research reactor. After neutron irradiation, the radioisotopes of trace elements in the nanocrystalline 3C-SiC were studied as time functions. The identification of isotopes which significantly increased the activity of the samples as a result of neutron radiation was carried out. Nanocrystalline 3C-SiC are synthesized by standard laser technique and the purity of samples was determined by the k0-based Instrumental Neutron Activation Analysis (k0-INAA) method. Trace elements concentration in the 3C-SiC nanoparticles were determined by the radionuclides of appropriate elements. The trace element isotopes concentration have been calculated in percentage according to k0-INAA method.

  7. High-Temperature (1200-1400°C) Dry Oxidation of 3C-SiC on Silicon

    Science.gov (United States)

    Sharma, Y. K.; Li, F.; Jennings, M. R.; Fisher, C. A.; Pérez-Tomás, A.; Thomas, S.; Hamilton, D. P.; Russell, S. A. O.; Mawby, P. A.

    2015-11-01

    In a novel approach, high temperatures (1200-1400°C) were used to oxidize cubic silicon carbide (3C-SiC) grown on silicon substrate. High-temperature oxidation does not significantly affect 3C-SiC doping concentration, 3C-SiC structural composition, or the final morphology of the SiO2 layer, which remains unaffected even at 1400°C (the melting point of silicon is 1414°C). Metal-oxide-semiconductor capacitors (MOS-C) and lateral channel metal-oxide-semiconductor field-effect-transistors (MOSFET) were fabricated by use of the high-temperature oxidation process to study 3C-SiC/SiO2 interfaces. Unlike 4H-SiC MOSFET, there is no extra benefit of increasing the oxidation temperature from 1200°C to 1400°C. All the MOSFET resulted in a maximum field-effect mobility of approximately 70 cm2/V s.

  8. Conventional and 360 degree electron tomography of a micro-crystalline silicon solar cell

    DEFF Research Database (Denmark)

    Duchamp, Martial; Ramar, Amuthan; Kovács, András

    2011-01-01

    Bright-field (BF) and annular dark-field (ADF) electron tomography in the transmission electron microscope (TEM) are used to characterize elongated porous regions or cracks (simply referred to as cracks thereafter) in micro-crystalline siliconc-Si:H) solar cell. The limitations of inferring...

  9. a-Si:H/c-Si heterojunction front- and back contacts for silicon solar cells with p-type base

    Energy Technology Data Exchange (ETDEWEB)

    Rostan, Philipp Johannes

    2010-07-01

    This thesis reports on low temperature amorphous silicon back and front contacts for high-efficiency crystalline silicon solar cells with a p-type base. The back contact uses a sequence of intrinsic amorphous (i-a-Si:H) and boron doped microcrystalline (p-{mu}c-Si:H) silicon layers fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) and a magnetron sputtered ZnO:Al layer. The back contact is finished by evaporating Al onto the ZnO:Al and altogether prepared at a maximum temperature of 220 C. Analysis of the electronic transport of mobile charge carriers at the back contact shows that the two high-efficiency requirements low back contact series resistance and high quality c-Si surface passivation are in strong contradiction to each other, thus difficult to achieve at the same time. The preparation of resistance- and effective lifetime samples allows one to investigate both requirements independently. Analysis of the majority charge carrier transport on complete Al/ZnO:Al/a-Si:H/c-Si back contact structures derives the resistive properties. Measurements of the effective minority carrier lifetime on a-Si:H coated wafers determines the back contact surface passivation quality. Both high-efficiency solar cell requirements together are analyzed in complete photovoltaic devices where the back contact series resistance mainly affects the fill factor and the back contact passivation quality mainly affects the open circuit voltage. The best cell equipped with a diffused emitter with random texture and a full-area a-Si:H/c-Si back contact has an independently confirmed efficiency {eta} = 21.0 % with an open circuit voltage V{sub oc} = 681 mV and a fill factor FF = 78.7 % on an area of 1 cm{sup 2}. An alternative concept that uses a simplified a-Si:H layer sequence combined with Al-point contacts yields a confirmed efficiency {eta} = 19.3 % with an open circuit voltage V{sub oc} = 655 mV and a fill factor FF = 79.5 % on an area of 2 cm{sup 2}. Analysis of the

  10. Fabrication of c-Si:H(p)/c-Si(n) Heterojunction Solar Cells with Microcrystalline Emitters

    Institute of Scientific and Technical Information of China (English)

    ZHOU Bing-Qing; LIU Feng-Zhen; ZHANG Qun-Fang; XU Ying; ZHOU Yu-Qin; LIU Jin-Long; ZHU Mei-Fang

    2006-01-01

    The p-type microcrystalline silicon (fj,c-Si) on n-type crystalline silicon (c-Si) heterojunction solar cells is fabricated by radio-frequency plasma enhanced chemical vapour deposition (rf-PECVD). The effect of the pc-Si:H p-layers on the performance of the heterojunction solar cells is investigated. Optimum μcSi:H p-layer is obtained with hydrogen dilution ratio of 99.65%, rf-power of 0.08 W/cm2, gas phase doping ratio of 0.125%, and the p-layer thickness of 15 nm. We fabricate μc-Si:H(p)/c-Si(n) heterojunction solar cells without texturing and obtained an efficiency of 13.4%. The comparisons of the solar-cell performances using different surface passivation techniques are discussed.

  11. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Directory of Open Access Journals (Sweden)

    Yaser Abdulraheem

    2014-05-01

    Full Text Available An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si wafers by plasma enhanced chemical vapor deposition (PECVD. The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause

  12. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Abdulraheem, Yaser, E-mail: yaser.abdulraheem@kuniv.edu.kw [Electrical Engineering Department, College of Engineering and Petroleum, Kuwait University. P.O. Box 5969, 13060 Safat (Kuwait); Gordon, Ivan; Bearda, Twan; Meddeb, Hosny; Poortmans, Jozef [IMEC, Kapeldreef 75, 3001, Leuven (Belgium)

    2014-05-15

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  13. Neutron irradiation and frequency effects on the electrical conductivity of nanocrystalline silicon carbide (3C-SiC)

    Science.gov (United States)

    Huseynov, Elchin

    2016-09-01

    In this present work nanocrystalline silicon carbide (3C-SiC) has been irradiated with neutron flux (∼ 2 ×1013 ncm-2s-1) up to 20 hours at different periods. Electrical conductivity of nanocrystalline 3C-SiC particles (∼18 nm) is comparatively analyzed before and after neutron irradiation. The frequency dependencies of electrical conductivity of 3C-SiC nanoparticles is reviewed at 100 K-400 K temperature range before and after irradiation. The measurements were carried out at 0.1 Hz-2.5 MHz frequency ranges and at different temperatures. Radiation-induced conductivity (RIC) was observed in the nanocrystalline 3C-SiC particles after neutron irradiation and this conductivity study as a function of frequency are presented. The type of conductivity has been defined based on the interdependence between real and imaginary parts of electrical conductivity function. Based on the obtained results the mechanism behind the electrical conductivity of nanocrystalline 3C-SiC particles is explained in detail.

  14. Mitigating mechanical failure of crystalline silicon electrodes for lithium batteries by morphological design.

    Science.gov (United States)

    An, Yonghao; Wood, Brandon C; Ye, Jianchao; Chiang, Yet-Ming; Wang, Y Morris; Tang, Ming; Jiang, Hanqing

    2015-07-21

    Although crystalline silicon (c-Si) anodes promise very high energy densities in Li-ion batteries, their practical use is complicated by amorphization, large volume expansion and severe plastic deformation upon lithium insertion. Recent experiments have revealed the existence of a sharp interface between crystalline Si (c-Si) and the amorphous LixSi alloy during lithiation, which propagates with a velocity that is orientation dependent; the resulting anisotropic swelling generates substantial strain concentrations that initiate cracks even in nanostructured Si. Here we describe a novel strategy to mitigate lithiation-induced fracture by using pristine c-Si structures with engineered anisometric morphologies that are deliberately designed to counteract the anisotropy in the crystalline/amorphous interface velocity. This produces a much more uniform volume expansion, significantly reducing strain concentration. Based on a new, validated methodology that improves previous models of anisotropic swelling of c-Si, we propose optimal morphological designs for c-Si pillars and particles. The advantages of the new morphologies are clearly demonstrated by mesoscale simulations and verified by experiments on engineered c-Si micropillars. The results of this study illustrate that morphological design is effective in improving the fracture resistance of micron-sized Si electrodes, which will facilitate their practical application in next-generation Li-ion batteries. The model and design approach present in this paper also have general implications for the study and mitigation of mechanical failure of electrode materials that undergo large anisotropic volume change upon ion insertion and extraction.

  15. Physics and technology of amorphous-crystalline heterostructure silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Sark, Wilfried G.J.H.M. van [Utrecht Univ. (Netherlands). Copernicus Institute, Science Technology and Society; Roca, Francesco [Unita Tecnologie Portici, Napoli (Italy). ENEA - Agenzia Nazionale per le Nuove Tecnologie, l' Energia e lo Sviluppo Economico Sostenibile; Korte, Lars [Helmholtz-Zentrum Berlin fuer Materialien und Energie (Germany). Inst. Silizium-Photovoltaik

    2012-07-01

    The challenge of developing photovoltaic (PV) technology to a cost-competitive alternative for established energy sources can be achieved using simple, high-throughput mass-production compatible processes. Issues to be addressed for large scale PV deployment in large power plants or in building integrated applications are enhancing the performance of solar energy systems by increasing solar cell efficiency, using low amounts of materials which are durable, stable, and abundant on earth, and reducing manufacturing and installation cost. Today's solar cell multi-GW market is dominated by crystalline silicon (c-Si) wafer technology, however new cell concepts are entering the market. One very promising solar cell design to answer these needs is the silicon hetero-junction solar cell, of which the emitter and back surface field are basically produced by a low temperature growth of ultra-thin layers of amorphous silicon. In this design, amorphous silicon (a-Si:H) constitutes both ''emitter'' and ''base-contact/back surface field'' on both sides of a thin crystalline silicon wafer-base (c-Si) where the photogenerated electrons and holes are generated; at the same time, a Si:H passivates the c-Si surface. Recently, cell efficiencies above 23% have been demonstrated for such solar cells. In this book, the editors present an overview of the state-of-the-art in physics and technology of amorphous-crystalline heterostructure silicon solar cells. (orig.)

  16. Highly efficient crystalline silicon/Zonyl fluorosurfactant-treated organic heterojunction solar cells

    Science.gov (United States)

    Liu, Qiming; Ono, Masahiro; Tang, Zeguo; Ishikawa, Ryo; Ueno, Keiji; Shirai, Hajime

    2012-04-01

    We demonstrate a highly efficient hybrid crystalline silicon (c-Si) based photovoltaic devices with hole-transporting transparent conductive poly-(3,4-ethlenedioxythiophene):poly(styrenesufonic acid) (PEDOT:PSS) films, incorporating a Zonyl fluorosurfactant as an additive, compared to non additive devices. The usage of a 0.1% Zonly treated PEDOT:PSS improved the adhesion of precursor solution on hydrophobic c-Si wafer without any oxidation process. The average power conversion efficiency η value was 10.8%-11.3%, which was superior to those of non-treated devices. Consequently, c-Si/Zonyl-treated PEDOT:PSS heterojunction devices exhibited the highest η of 11.34%. The Zonyl-treated soluble PEDOT:PSS composite is promising as a hole-transporting transparent conducting layer for c-Si/organic photovoltaic applications.

  17. Boron-doped hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for application in thin-film silicon solar cells

    NARCIS (Netherlands)

    Lambertz, A.; Finger, F.; Holländer, B.; Rath, J.K.; Schropp, R.E.I.

    2011-01-01

    We report on the development of p-type μc-SiOx:H material, in particular the relationship between the deposition parameters and the material properties like band gap, electrical conductivity, and crystalline volume fraction. The material was deposited from gas mixtures of silane, carbon dioxide and

  18. Novel Scheme of Amorphous/Crystalline Silicon Heterojunction Solar Cell

    Energy Technology Data Exchange (ETDEWEB)

    De Iuliis, S.; Geerligs, L.J. [ECN Solar Energy, Petten (Netherlands); Tucci, M.; Serenelli, L.; Salza, E. [ENEA Research Center Casaccia, Roma (Italy); De Cesare, G.; Caputo, D.; Ceccarelli, M. [University ' Sapienza' , Department of Electronic Engineering, Roma (Italy)

    2007-01-15

    In this paper we investigate in detail how the heterostructure concept can be implemented in an interdigitated back contact solar cell, in which both the emitters are formed on the back side of the c-Si wafer by amorphous/crystalline silicon heterostructure, and at the same time the grid-less front surface is passivated by a double layer of amorphous silicon and silicon nitride, which also provides an anti-reflection coating. The entire process, held at temperature below 300C, is photolithography-free, using a metallic self-aligned mask to create the interdigitated pattern, and we show that the alignment is feasible. An open-circuit voltage of 687 mV has been measured on a p-type monocrystalline silicon wafer. The mask-assisted deposition process does not influence the uniformity of the deposited amorphous silicon layers. Photocurrent limits factor has been investigated with the aid of one-dimensional modeling and quantum efficiency measurements. On the other hand several technological aspects that limit the fill factor and the short circuit current density still need improvements.

  19. Influence of etching parameters on optoelectronic properties of c-Si/porous silicon heterojunction - application to solar cells

    Science.gov (United States)

    Bechiri, Fatiha; Zerdali, Mokhtar; Rahmoun, Ilham; Hamzaoui, Saad; Adnane, Mohamed; Sahraoui, Taoufik

    2013-03-01

    Thin layers of nanoporous silicon PS were synthesized by anodic etching, in order to develop photovoltaic cells. We proposed a diluted concentration of hydrofluoric acid with different etching current densities (1, 3, 5 mA/cm2) on a fairly short time anodization. Observations by scanning electron microscope, electrical measurements and optical measurements revealed that the structural properties of PS layers depended on strong conditions of prints. The reverse and forward component of the I-V characteristics showed an appropriate method to explore and extract the parameters of the diode ideality factor n. The optimum conditions of formation of PS were: HF concentration of 1% and an etching current density of mA/cm2. Unlike silicon, which has a low absorption of short visible wavelengths, it was shown that the PS had wide energy gap of ≈ 2 eV, and a marked improvement in the absorption between 400 and 600 nm. This property has been used to optimize the response of the solar cell Ni/PS/c-Si. Efficiency performance close to 4.2% was obtained with a Voc of 400 mV, and fill factor of 46%. The solar cell exhibited better response than the reference cell Ni/c-Si. These results show that PS/c-Si heterojunction has a potential for photovoltaic applications.

  20. Growth of boron doped hydrogenated nanocrystalline cubic silicon carbide (3C-SiC) films by Hot Wire-CVD

    Energy Technology Data Exchange (ETDEWEB)

    Pawbake, Amit [School of Energy Studies, Savitribai Phule Pune University, Pune 411 007 (India); Tata Institute of Fundamental Research, Colaba, Mumbai 400 005 (India); Mayabadi, Azam; Waykar, Ravindra; Kulkarni, Rupali; Jadhavar, Ashok [School of Energy Studies, Savitribai Phule Pune University, Pune 411 007 (India); Waman, Vaishali [Modern College of Arts, Science and Commerce, Shivajinagar, Pune 411 005 (India); Parmar, Jayesh [Tata Institute of Fundamental Research, Colaba, Mumbai 400 005 (India); Bhattacharyya, Somnath [Department of Metallurgical and Materials Engineering, IIT Madras, Chennai 600 036 (India); Ma, Yuan‐Ron [Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan (China); Devan, Rupesh; Pathan, Habib [Department of Physics, Savitribai Phule Pune University, Pune 411007 (India); Jadkar, Sandesh, E-mail: sandesh@physics.unipune.ac.in [Department of Physics, Savitribai Phule Pune University, Pune 411007 (India)

    2016-04-15

    Highlights: • Boron doped nc-3C-SiC films prepared by HW-CVD using SiH{sub 4}/CH{sub 4}/B{sub 2}H{sub 6}. • 3C-Si-C films have preferred orientation in (1 1 1) direction. • Introduction of boron into SiC matrix retard the crystallanity in the film structure. • Film large number of SiC nanocrystallites embedded in the a-Si matrix. • Band gap values, E{sub Tauc} and E{sub 04} (E{sub 04} > E{sub Tauc}) decreases with increase in B{sub 2}H{sub 6} flow rate. - Abstract: Boron doped nanocrystalline cubic silicon carbide (3C-SiC) films have been prepared by HW-CVD using silane (SiH{sub 4})/methane (CH{sub 4})/diborane (B{sub 2}H{sub 6}) gas mixture. The influence of boron doping on structural, optical, morphological and electrical properties have been investigated. The formation of 3C-SiC films have been confirmed by low angle XRD, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), Fourier transform infra-red (FTIR) spectroscopy and high resolution-transmission electron microscopy (HR-TEM) analysis whereas effective boron doping in nc-3C-SiC have been confirmed by conductivity, charge carrier activation energy, and Hall measurements. Raman spectroscopy and HR-TEM analysis revealed that introduction of boron into the SiC matrix retards the crystallanity in the film structure. The field emission scanning electron microscopy (FE-SEM) and non contact atomic force microscopy (NC-AFM) results signify that 3C-SiC film contain well resolved, large number of silicon carbide (SiC) nanocrystallites embedded in the a-Si matrix having rms surface roughness ∼1.64 nm. Hydrogen content in doped films are found smaller than that of un-doped films. Optical band gap values, E{sub Tauc} and E{sub 04} decreases with increase in B{sub 2}H{sub 6} flow rate.

  1. Bond Angles in the Crystalline Silicon/Silicon Nitride Interface

    Science.gov (United States)

    Leonard, Robert H.; Bachlechner, Martina E.

    2006-03-01

    Silicon nitride deposited on a silicon substrate has major applications in both dielectric layers in microelectronics and as antireflection and passivation coatings in photovoltaic applications. Molecular dynamic simulations are performed to investigate the influence of temperature and rate of externally applied strain on the structural and mechanical properties of the silicon/silicon nitride interface. Bond-angles between various atom types in the system are used to find and understand more about the mechanisms leading to the failure of the crystal. Ideally in crystalline silicon nitride, bond angles of 109.5 occur when a silicon atom is at the vertex and 120 angles occur when a nitrogen atom is at the vertex. The comparison of the calculated angles to the ideal values give information on the mechanisms of failure in silicon/silicon nitride system.

  2. Improved Josephson Qubits incorporating Crystalline Silicon Dielectrics

    Science.gov (United States)

    Gao, Yuanfeng; Maurer, Leon; Hover, David; Patel, Umeshkumar; McDermott, Robert

    2010-03-01

    Josephson junction phase quibts are a leading candidate for scalable quantum computing in the solid state. Their energy relaxation times are currently limited by microwave loss induced by a high density of two-level state (TLS) defects in the amorphous dielectric films of the circuit. It is expected that the integration of crystalline, defect-free dielectrics into the circuits will yield substantial improvements in qubit energy relaxation times. However, the epitaxial growth of a crystalline dielectric on a metal underlayer is a daunting challenge. Here we describe a novel approach in which the crystalline silicon nanomembrane of a Silicon-on-Insulator (SOI) wafer is used to form the junction shunt capacitor. The SOI wafer is thermocompression bonded to the device wafer. The handle and buried oxide layers of the SOI are then etched away, leaving the crystalline silicon layer for subsequent processing. We discuss device fabrication issues and present microwave transport data on lumped-element superconducting resonators incorporating the crystalline silicon.

  3. University Crystalline Silicon Photovoltaics Research and Development

    Energy Technology Data Exchange (ETDEWEB)

    Ajeet Rohatgi; Vijay Yelundur; Abasifreke Ebong; Dong Seop Kim

    2008-08-18

    The overall goal of the program is to advance the current state of crystalline silicon solar cell technology to make photovoltaics more competitive with conventional energy sources. This program emphasizes fundamental and applied research that results in low-cost, high-efficiency cells on commercial silicon substrates with strong involvement of the PV industry, and support a very strong photovoltaics education program in the US based on classroom education and hands-on training in the laboratory.

  4. Superacid Passivation of Crystalline Silicon Surfaces.

    Science.gov (United States)

    Bullock, James; Kiriya, Daisuke; Grant, Nicholas; Azcatl, Angelica; Hettick, Mark; Kho, Teng; Phang, Pheng; Sio, Hang C; Yan, Di; Macdonald, Daniel; Quevedo-Lopez, Manuel A; Wallace, Robert M; Cuevas, Andres; Javey, Ali

    2016-09-14

    The reduction of parasitic recombination processes commonly occurring within the silicon crystal and at its surfaces is of primary importance in crystalline silicon devices, particularly in photovoltaics. Here we explore a simple, room temperature treatment, involving a nonaqueous solution of the superacid bis(trifluoromethane)sulfonimide, to temporarily deactivate recombination centers at the surface. We show that this treatment leads to a significant enhancement in optoelectronic properties of the silicon wafer, attaining a level of surface passivation in line with state-of-the-art dielectric passivation films. Finally, we demonstrate its advantage as a bulk lifetime and process cleanliness monitor, establishing its compatibility with large area photoluminescence imaging in the process.

  5. Donor-hydrogen complexes in crystalline silicon

    NARCIS (Netherlands)

    Liang, Z.N.; Niesen, L; Haas, C; Denteneer, P.J.H.

    1996-01-01

    Experimental results are presented on the study of Sb-H complexes in crystalline silicon, employing Sb-119 --> Sn-119 source Mossbauer spectroscopy and a low-energy H implantation technique. In addition to a visible component, we observe a large decrease of the Mossbauer intensity associated with

  6. Donor-hydrogen complexes in crystalline silicon

    NARCIS (Netherlands)

    Liang, Z.N.; Niesen, L; Haas, C; Denteneer, P.J.H.

    1996-01-01

    Experimental results are presented on the study of Sb-H complexes in crystalline silicon, employing Sb-119 --> Sn-119 source Mossbauer spectroscopy and a low-energy H implantation technique. In addition to a visible component, we observe a large decrease of the Mossbauer intensity associated with th

  7. Crystalline Silicon Dielectrics for Superconducting Qubit Circuits

    Science.gov (United States)

    Hover, David; Peng, Weina; Sendelbach, Steven; Eriksson, Mark; McDermott, Robert

    2009-03-01

    Superconducting qubit energy relaxation times are limited by microwave loss induced by a continuum of two-level state (TLS) defects in the dielectric materials of the circuit. State-of-the-art phase qubit circuits employ a micron-scale Josephson junction shunted by an external capacitor. In this case, the qubit T1 time is directly proportional to the quality factor (Q) of the capacitor dielectric. The amorphous capacitor dielectrics that have been used to date display intrinsic Q of order 10^3 to 10^4. Shunt capacitors with a Q of 10^6 are required to extend qubit T1 times well into the microsecond range. Crystalline dielectric materials are an attractive candidate for qubit capacitor dielectrics, due to the extremely low density of TLS defects. However, the robust integration of crystalline dielectrics with superconducting qubit circuits remains a challenge. Here we describe a novel approach to the realization of high-Q crystalline capacitor dielectrics for superconducting qubit circuits. The capacitor dielectric is a crystalline silicon nanomembrane. We discuss characterization of crystalline silicon capacitors with low-power microwave transport measurements at millikelvin temperatures. In addition, we report progress on integrating the crystalline capacitor process with Josephson qubit fabrication.

  8. Effects of Preform Density on Structure and Property of C/C-SiC Composites Fabricated by Gaseous Silicon Infiltration

    Directory of Open Access Journals (Sweden)

    CAO Yu

    2016-07-01

    Full Text Available The 3-D needled C/C preforms with different densities deposited by chemical vapor infiltration (CVI method were used to fabricate C/C-SiC composites by gaseous silicon infiltration (GSI. The porosity and CVI C thickness of the preforms were studied, and the effects of preform density on the mechanical and thermal properties of C/C-SiC composites were analyzed. The results show that with the increase of preform density, the preform porosity decreases and the CVI C thickness increases from several hundred nanometers to several microns. For the C/C-SiC composites, as the preform density increases, the residual C content increases while the density and residual Si content decreases. The SiC content first keeps at a high level of about 40% (volume fraction, which then quickly reduces. Meanwhile, the mechanical properties increase to the highest values when the preform density is 1.085g/cm3, with the flexure strength up to 308.31MP and fracture toughness up to 11.36MPa·m1/2, which then decrease as the preform density further increases. The thermal conductivity and CTE of the composites, however, decrease with the increase of preform density. It is found that when the preform porosity is too high, sufficient infiltration channels lead to more residual Si, and thinner CVI C thickness results in the severe corrosion of the reinforcing fibers by Si and lower mechanical properties. When the preform porosity is relatively low, the contents of Si and SiC quickly reduce since the infiltration channels are rapidly blocked, resulting in the formation of large closed pores and not high mechanical properties.

  9. Current enhancement in crystalline silicon photovoltaic by low-cost nickel silicide back contact

    KAUST Repository

    Bahabry, R. R.

    2016-11-30

    We report short circuit current (Jsc) enhancement in crystalline silicon (C-Si) photovoltaic (PV) using low-cost Ohmic contact engineering by integration of Nickel mono-silicide (NiSi) for back contact metallization as an alternative to the status quo of using expensive screen printed silver (Ag). We show 2.6 mA/cm2 enhancement in the short circuit current (Jsc) and 1.2 % increment in the efficiency by improving the current collection due to the low specific contact resistance of the NiSi on the heavily Boron (B) doped Silicon (Si) interface.

  10. Band offsets at the crystalline / hydrogenated amorphous silicon interface from first-principles

    Science.gov (United States)

    Hazrati, Ebrahim; Jarolimek, Karol; de Wijs, Gilles A.; InstituteMolecules; Materials Team

    2015-03-01

    The heterojunction formed between crystalline silicon (c-Si) and hydrogenated amorphous silicon (a-Si:H) is a key component of a new type of high-efficiency silicon solar cell. Since a-Si:H has a larger band gap than c-Si, band offsets are formed at the interface. A band offset at the minority carrier band will mitigate recombination and lead to an increased efficiency. Experimental values of band offsets scatter in a broad range. However, a recent meta-analysis of the results (W. van Sark et al.pp. 405, Springer 2012) gives a larger valence offset (0.40 eV) than the conduction offset (0.15 eV). In light of the conflicting reports our goal is to calculate the band offsets at the c-Si/a-Si:H interface from first-principles. We have prepared several atomistic models of the interface. The crystalline part is terminated with (111) surfaces on both sides. The amorphous structure is generated by simulating an annealing process at 1100 K, with DFT molecular dynamics. Once the atomistic is ready it can be used to calculate the electronic structure of the interface. Our preliminary results show that the valence offset is larger than the conduction band offset.

  11. Study of an Amorphous Silicon Oxide Buffer Layer for p-Type Microcrystalline Silicon Oxide/n-Type Crystalline Silicon Heterojunction Solar Cells and Their Temperature Dependence

    Directory of Open Access Journals (Sweden)

    Taweewat Krajangsang

    2014-01-01

    Full Text Available Intrinsic hydrogenated amorphous silicon oxide (i-a-SiO:H films were used as front and rear buffer layers in crystalline silicon heterojunction (c-Si-HJ solar cells. The surface passivity and effective lifetime of these i-a-SiO:H films on an n-type silicon wafer were improved by increasing the CO2/SiH4 ratios in the films. Using i-a-SiO:H as the front and rear buffer layers in c-Si-HJ solar cells was investigated. The front i-a-SiO:H buffer layer thickness and the CO2/SiH4 ratio influenced the open-circuit voltage (Voc, fill factor (FF, and temperature coefficient (TC of the c-Si-HJ solar cells. The highest total area efficiency obtained was 18.5% (Voc=700 mV, Jsc=33.5 mA/cm2, and FF=0.79. The TC normalized for this c-Si-HJ solar cell efficiency was −0.301%/°C.

  12. N型单晶硅衬底上非晶硅/单晶硅异质结太阳电池计算机模拟%COMPUTER SIMULATION OF a-Si:H/c-Si HETERJUNCTION SOLAR CELLS ON N-TYPE SILICON CRYSTALLINE

    Institute of Scientific and Technical Information of China (English)

    任丙彦; 张燕; 郭贝; 张兵; 李洪源; 许颖; 王文静

    2008-01-01

    采用德国HMI研发的AFORS-HET软件模拟了N型衬底非晶硅,单晶硅异质结太阳电池的特性,结果表明随着发射层厚度的增加,短路电流下降,电池的短波响应变差.在非晶硅,单晶硅异质结界面处加入不同的界面态密度(Dit).发现当Dit1012cm-2·eV-1时,电池的开路电压和填充因子均大幅减小,导致电池效率降低.当在非晶硅,单晶硅异质结界面处加入本征非晶缓冲层后,电池性能明显改善,但是缓冲层厚度应控制在30nm以内.模拟的a-Si/i-a-Si:H/c-Si/i-a-Si:H/n+a-Si双面异质结太阳电池的最高转换效率达到28.47%.

  13. Basic research challenges in crystalline silicon photovoltaics

    Energy Technology Data Exchange (ETDEWEB)

    Werner, J.H. [Max-Planck-Institut fuer Festkoerperforschung, Stuttgart (Germany)

    1995-08-01

    Silicon is abundant, non-toxic and has an ideal band gap for photovoltaic energy conversion. Experimental world record cells of 24 % conversion efficiency with around 300 {mu}m thickness are only 4 % (absolute) efficiency points below the theoretical Auger recombination-limit of around 28 %. Compared with other photovoltaic materials, crystalline silicon has only very few disadvantages. The handicap of weak light absorbance may be mastered by clever optical designs. Single crystalline cells of only 48 {mu}m thickness showed 17.3 % efficiency even without backside reflectors. A technology of solar cells from polycrystalline Si films on foreign substrates arises at the horizon. However, the disadvantageous, strong activity of grain boundaries in Si could be an insurmountable hurdle for a cost-effective, terrestrial photovoltaics based on polycrystalline Si on foreign substrates. This talk discusses some basic research challenges related to a Si based photovoltaics.

  14. Novel Ag-doped glass frits for high-efficiency crystalline silicon solar cells.

    Science.gov (United States)

    Yuan, Sheng; Chen, Yongji; Mei, Zongwei; Zhang, Ming-Jian; Gao, Zhou; Wang, Xingbo; Jiang, Xing; Pan, Feng

    2017-06-06

    Glass frits play an important role in the front contact electrodes of crystalline silicon (c-Si) solar cells. In this work, we developed a novel glass frit by doping Ag into a glass frit in the process of high-temperature synthesis. When the Ag paste including this novel glass frit was used as the front contact electrode of silicon solar cells, the conversion efficiency of poly-crystalline silicon (pc-Si) solar cells was improved by 1.9% compared to the glass frit without Ag. Through SEM characterisation and calculation of series resistance, we further found that the interface between Ag and Si was improved and the contact resistance of Ag and Si was greatly reduced, which were believed to be responsible for the improvement of solar cell performance. This work shows great guidance significance to develop novel and highly efficient commercial glass frits applied in solar cells in the future.

  15. Mechanical Properties of Crystalline Silicon Carbide Nanowires.

    Science.gov (United States)

    Zhang, Huan; Ding, Weiqiang; Aidun, Daryush K

    2015-02-01

    In this paper, the mechanical properties of crystalline silicon carbide nanowires, synthesized with a catalyst-free chemical vapor deposition method, were characterized with nanoscale tensile testing and mechanical resonance testing methods inside a scanning electron microscope. Tensile testing of individual silicon carbide nanowire was performed to determine the tensile properties of the material including the tensile strength, failure strain and Young's modulus. The silicon carbide nanowires were also excited to mechanical resonance in the scanning electron microscope vacuum chamber using mechanical excitation and electrical excitation methods, and the corresponding resonance frequencies were used to determine the Young's modulus of the material according to the simple beam theory. The Young's modulus values from tensile tests were in good agreement with the ones obtained from the mechanical resonance tests.

  16. Performance characterization of thin-film-silicon based solar modules under clouded and clear sky conditions in comparison to crystalline silicon modules

    Science.gov (United States)

    Weicht, J. A.; Rasch, R.; Behrens, G.; Hamelmann, F. U.

    2016-07-01

    For a precise prediction of the energy yield of amorphous ( a-Si) and amorphous-microcrystalline tandem ( a-Si/ μc-Si) thinfilm-silicon photovoltaic (PV) modules it is important to know their performance ratio under different light conditions. The efficiency of solar modules is an important value for the monitoring and planning of PV-systems. The efficiency of a-Si solar modules shows no significant changes in the performance ratio at clouded or clear sky conditions. The efficiency of crystalline silicon-based ( c-Si) and a-Si/ μc-Si solar modules shows a lower efficiency for fully clouded conditions without direct irradiation compared to conditions with direct irradiation (clear sky). [Figure not available: see fulltext.

  17. PREPARATION AND CHARACTERIZATION OF POLY-CRYSTALLINE SILICON THIN FILM

    Institute of Scientific and Technical Information of China (English)

    Y.F. Hu; H. Shen; Z.Y. Liu; L.S. Wen

    2003-01-01

    Poly-crystalline silicon thin film has big potential of reducing the cost of solar cells.In this paper the preparation of thin film is introduced, and then the morphology of poly-crystalline thin film is discussed. On the film we developed poly-crystalline silicon thin film solar cells with efficiency up to 6. 05% without anti-reflection coating.

  18. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride

    Science.gov (United States)

    Lowden, Richard A.

    1994-01-01

    A process for chemical vapor deposition of crystalline silicon nitride which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide.

  19. Scanning transmission electron microscope analysis of amorphous-Si insertion layers prepared by catalytic chemical vapor deposition, causing low surface recombination velocities on crystalline silicon wafers

    OpenAIRE

    2012-01-01

    Microstructures of stacked silicon-nitride/amorphous-silicon/crystalline-silicon (SiN_x/a-Si/c-Si) layers prepared by catalytic chemical vapor deposition were investigated with scanning transmission electron microscopy to clarify the origin of the sensitive dependence of surface recombination velocities (SRVs) of the stacked structure on the thickness of the a-Si layer. Stacked structures with a-Si layers with thicknesses greater than 10 nm exhibit long effective carrier lifetimes, while thos...

  20. Wide-Gap p-μc-Si1-xOx:H Films and Their Application to Amorphous Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Taweewat Krajangsang

    2013-01-01

    Full Text Available Optimization of p-type hydrogenated microcrystalline silicon oxide thin films (p-μc-Si1-xOx:H by very high frequency plasma enhanced chemical vapor deposition 40 MHz method for use as a p-layer of a-Si:H solar cells was performed. The properties of p-μc-Si1-xOx:H films were characterized by conductivity, Raman scattering spectroscopy, and spectroscopic ellipsometry. The wide optical band gap p-μc-Si1-xOx:H films were optimized by CO2/SiH4 ratio and H2/SiH4 dilution. Besides, the effects of wide-gap p-μc-Si1-xOx:H layer on the performance of a-Si:H solar cells with various optical band gaps of p-layer were also investigated. Furthermore, improvements of open circuit voltage, short circuit current, and performance of the solar cells by using the effective wide-gap p-μc-Si1-xOx:H were observed in this study. These results indicate that wide-gap p-μc-Si1-xOx:H is promising to use as window layer in a-Si:H solar cells.

  1. An overview of crystalline silicon solar cell technology: Past, present, and future

    Science.gov (United States)

    Sopian, K.; Cheow, S. L.; Zaidi, S. H.

    2017-09-01

    Crystalline silicon (c-Si) solar cell, ever since its inception, has been identified as the only economically and environmentally sustainable renewable resource to replace fossil fuels. Performance c-Si based photovoltaic (PV) technology has been equal to the task. Its price has been reduced by a factor of 250 over last twenty years (from ˜ 76 USD to ˜ 0.3 USD); its market growth is expected to reach 100 GWP by 2020. Unfortunately, it is still 3-4 times higher than carbon-based fuels. With the matured PV manufacturing technology as it exists today, continuing price reduction poses stiff challenges. Alternate manufacturing approaches in combination with thin wafers, low (cost-based analysis of advanced solar cell manufacturing technologies aimed at higher (˜ 22 %) efficiency with existing equipment and processes.

  2. Cat-doping: Novel method for phosphorus and boron shallow doping in crystalline silicon at 80 °C

    Energy Technology Data Exchange (ETDEWEB)

    Matsumura, Hideki; Hayakawa, Taro; Ohta, Tatsunori; Nakashima, Yuki; Miyamoto, Motoharu; Thi, Trinh Cham; Koyama, Koichi; Ohdaira, Keisuke [Japan Advanced Institute of Science and Technology (JAIST), Asahidai, Nomi-shi, Ishikawa-ken 923-1292 (Japan)

    2014-09-21

    Phosphorus (P) or boron (B) atoms can be doped at temperatures as low as 80 to 350 °C, when crystalline silicon (c-Si) is exposed only for a few minutes to species generated by catalytic cracking reaction of phosphine (PH₃) or diborane (B₂H₆) with heated tungsten (W) catalyzer. This paper is to investigate systematically this novel doping method, “Cat-doping”, in detail. The electrical properties of P or B doped layers are studied by the Van der Pauw method based on the Hall effects measurement. The profiles of P or B atoms in c-Si are observed by secondary ion mass spectrometry mainly from back side of samples to eliminate knock-on effects. It is confirmed that the surface of p-type c-Si is converted to n-type by P Cat-doping at 80 °C, and similarly, that of n-type c-Si is to p-type by B Cat-doping. The doping depth is as shallow as 5 nm or less and the electrically activated doping concentration is 10¹⁸ to 10¹⁹cm⁻³ for both P and B doping. It is also found that the surface potential of c-Si is controlled by the shallow Cat-doping and that the surface recombination velocity of minority carriers in c-Si can be enormously lowered by this potential control.

  3. 77 FR 63788 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-10-17

    ... modules, laminates, and panels, consisting of crystalline silicon photovoltaic cells, whether or not... modules, laminates, and panels, consisting of crystalline silicon photovoltaic cells, whether or not... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into...

  4. 77 FR 73017 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-12-07

    ... modules, laminates, and panels, consisting of crystalline silicon photovoltaic cells, whether or not... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... issuing a countervailing duty order on crystalline silicon photovoltaic cells, whether or not...

  5. 77 FR 14732 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-03-13

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... of crystalline silicon photovoltaic cells, whether or not assembled into modules, from the People's.... \\1\\ See Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From...

  6. (Preoxidation cleaning optimization for crystalline silicon)

    Energy Technology Data Exchange (ETDEWEB)

    1991-01-01

    A series of controlled experiments has been performed in Sandia's Photovoltaic Device Fabrication Laboratory to evaluate the effect of various chemical surface treatments on the recombination lifetime of crystalline silicon wafers subjected to a high-temperature dry oxidation. From this series of experiments we have deduced a relatively simple yet effective cleaning sequence. We have also evaluated the effect of different chemical damage-removal etches for improving the recombination lifetime and surface smoothness of mechanically lapped wafers. This paper presents the methodology used, the experimental results obtained, and our experience with using this process on a continuing basis over a period of many months. 7 refs., 4 figs., 1 tab.

  7. Influence of the pattern shape on the photonic efficiency of front-side periodically patterned ultrathin crystalline silicon solar cells

    CERN Document Server

    Herman, Aline; Depauw, Valerie; Daif, Ounsi El; Deparis, Olivier

    2012-01-01

    Patterning the front side of an ultra-thin crystalline silicon (c Si) solar cell helps keeping the energy conversion efficiency high by compensating for the light absorption losses. A super-Gaussian mathematical expression was used in order to encompass a large variety of nanopattern shapes and to study their influence on the photonic performance. We prove that the enhancement in the maximum achievable photo-current is due to both impedance matching condition at short wavelengths and to the wave nature of light at longer wavelengths. We show that the optimal mathematical shape and parameters of the pattern depend on the c Si thickness. An optimal shape comes with a broad optimal parameter zone where fabricating errors would have much less influence on the efficiency. We prove that cylinders are not the best suited shape. To compare our model with a real slab, we fabricated a nanopatterned c Si slab via Nano Imprint Lithography.

  8. Impact of organic overlayers on a-Si:H/c-Si surface potential

    KAUST Repository

    Seif, Johannes P.

    2017-04-11

    Bilayers of intrinsic and doped hydrogenated amorphous silicon, deposited on crystalline silicon (c-Si) surfaces, simultaneously provide contact passivation and carrier collection in silicon heterojunction solar cells. Recently, we have shown that the presence of overlaying transparent conductive oxides can significantly affect the c-Si surface potential induced by these amorphous silicon stacks. Specifically, deposition on the hole-collecting bilayers can result in an undesired weakening of contact passivation, thereby lowering the achievable fill factor in a finished device. We test here a variety of organic semiconductors of different doping levels, overlaying hydrogenated amorphous silicon layers and silicon-based hole collectors, to mitigate this effect. We find that these materials enhance the c-Si surface potential, leading to increased implied fill factors. This opens opportunities for improved device performance.

  9. Effect of underlying silicon layer on microstructure and photoluminescence of rapid-thermal-annealed carbon and C/Si nanofilms

    Energy Technology Data Exchange (ETDEWEB)

    Chung, C.K., E-mail: ckchung@mail.ncku.edu.tw [Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC (China); Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan, ROC (China); Lai, C.W. [Department of Mechanical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC (China); Wu, B.H. [Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan, ROC (China)

    2013-09-15

    Highlights: •Photoluminescence (PL) of carbon films originated from recombination of confined electron–hole pairs. •Broad PL was an interesting topic using varied methods for Si and C reaction. •Asymmetrical broad PL of two-layer Si/C and three-layer Si/C/Si was demonstrated previously. •Here, another C/Si (underlying Si layer) films have further investigated for enhancement of symmetry-like PL. •The effect and mechanism of underlying Si layer thickness on microstructure and PL evolution of two-layer C/Si was studied. -- Abstract: A composite material for broad photoluminescence (PL) from asymmetry to more symmetry-like was proposed by the formation of Si nanocrystals (nc-Si), SiC nanoparticles (np-SiC) and sp{sup 2} carbon cluster which were made from the two-layer C/Si on Si(1 0 0) using rapid-thermal-annealing at 750 °C for 1 min. The effect of underlying Si layer thickness on the microstructure and broad PL of the annealed carbon and two-layer C/Si films has been investigated. Fourier-transform-infrared-absorption spectra indicated that very weak Si–C bonding peak was observed for the annealed single-C film and the enhanced intensity occurred at two-layer C/Si films with underlying thickness of 10–25 nm. Compared to the single-C film, the two-layer C/Si film was beneficial for formation of SiC which increased with Si thickness. A more symmetry-like broad PL band around 400–700 nm was observed at the annealed C/Si films with higher Si thickness of 25 nm while the annealed C film has weak and narrow band. Also, the enhanced symmetry-like PL band was attributed to more amount of np-SiC formation at the bottom of C/Si film together with reduced C thickness which can be potentially applied into white light emission material. The detailed mechanism of broad PL was proposed in terms of microstructure evolution.

  10. Microsystems enabled photovoltaics: 14.9% efficient 14 {mu}m thick crystalline silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Cruz-Campa, Jose L. [Sandia National Laboratories, M.S. 1080, 1515 Eubank Blvd. SE, Albuquerque, NM 87123 (United States); University of Texas at El Paso, Department of Electrical and Computer Engineering, 500 West University Avenue, El Paso, TX 79968 (United States); Okandan, Murat; Resnick, Paul J.; Clews, Peggy; Pluym, Tammy; Grubbs, Robert K.; Gupta, Vipin P.; Nielson, Gregory N. [Sandia National Laboratories, M.S. 1080, 1515 Eubank Blvd. SE, Albuquerque, NM 87123 (United States); Zubia, David [University of Texas at El Paso, Department of Electrical and Computer Engineering, 500 West University Avenue, El Paso, TX 79968 (United States)

    2011-02-15

    Crystalline silicon solar cells 10-15 times thinner than traditional commercial c-Si cells with 14.9% efficiency are presented with modeling, fabrication, and testing details. These cells are 14 {mu}m thick, 250 {mu}m wide, and have achieved 14.9% solar conversion efficiency under AM 1.5 spectrum. First, modeling results illustrate the importance of high-quality passivation to achieve high efficiency in thin silicon, back contacted solar cells. Then, the methodology used to fabricate these ultra thin devices by means of established microsystems processing technologies is presented. Finally, the optimization procedure to achieve high efficiency as well as the results of the experiments carried out with alumina and nitride layers as passivation coatings are discussed. (author)

  11. Simplified module assembly using back-contact crystalline-silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Gee, J.M.; Garrett, S.E.; Morgan, W.P.

    1997-11-01

    The authors are developing new module concepts that encapsulate and electrically connect all the crystalline-silicon (c-Si) photovoltaic (PV) cells in a module in a single step. The new assembly process (1) uses back-contact c-Si cells, (2) uses a module backplane that has both the electrical circuit, encapsulant, and backsheet in a single piece, and (3) uses a single-step process for assembly of these components into a module. This new process reduces module assembly cost by using planar processes that are easy to automate, by reducing the number of steps, and by eliminating low-throughput (e.g., individual cell tabbing, cell stringing, etc.) steps. The authors refer to this process as monolithic module assembly since it translates many of the advantages of monolithic module construction of thin-film PV modules to wafered c-Si PV modules. Preliminary development of the new module assembly process, and some estimations of the cost potential of the new process, are presented.

  12. Optimization of textured-dielectric coatings for crystalline-silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Gee, J.M. [Sandia National Labs., Albuquerque, NM (United States). Photovoltaic System Components Dept.; Gordon, R.; Liang, H. [Harvard Univ., Cambridge, MA (United States). Dept. of Chemistry

    1996-07-01

    The authors report on the optimization of textured-dielectric coatings for reflectance control in crystalline-silicon (c-Si) photovoltaic modules. Textured-dielectric coatings reduce encapsulated-cell reflectance by promoting optical confinement in the module encapsulation; i.e., the textured-dielectric coating randomizes the direction of rays reflected from the dielectric and from the c-Si cell so that many of these reflected rays experience total internal reflection at the glass-air interface. Some important results of this work include the following: the authors demonstrated textured-dielectric coatings (ZnO) deposited by a high-throughput low-cost deposition process; they identified factors important for achieving necessary texture dimensions; they achieved solar-weighted extrinsic reflectances as low as 6% for encapsulated c-Si wafers with optimized textured-ZnO coatings; and they demonstrated improvements in encapsulated cell performance of up to 0.5% absolute compared to encapsulated planar cells with single-layer antireflection coatings.

  13. Investigation of the agglomeration and amorphous transformation effects of neutron irradiation on the nanocrystalline silicon carbide (3C-SiC) using TEM and SEM methods

    Energy Technology Data Exchange (ETDEWEB)

    Huseynov, Elchin M., E-mail: elchin.h@yahoo.com [Department of Nanotechnology and Radiation Material Science, National Nuclear Research Center, Inshaatchilar pr. 4, AZ 1073 Baku (Azerbaijan); Institute of Radiation Problems of Azerbaijan National Academy of Sciences, B.Vahabzade 9, AZ 1143 Baku (Azerbaijan)

    2017-04-01

    Nanocrystalline 3C-SiC particles irradiated by neutron flux during 20 h in TRIGA Mark II light water pool type research reactor. Silicon carbide nanoparticles were analyzed by Scanning Electron Microscope (SEM) and Transmission Electron Microscopy (TEM) devices before and after neutron irradiation. The agglomeration of nanoparticles was studied comparatively before and after neutron irradiation. After neutron irradiation the amorphous layer surrounding the nanoparticles was analyzed in TEM device. Neutron irradiation defects in the 3C-SiC nanoparticles and other effects investigated by TEM device. The effect of irradiation on the crystal structure of the nanomaterial was studied by selected area electron diffraction (SAED) and electron diffraction patterns (EDP) analysis.

  14. Investigation of the agglomeration and amorphous transformation effects of neutron irradiation on the nanocrystalline silicon carbide (3C-SiC) using TEM and SEM methods

    Science.gov (United States)

    Huseynov, Elchin M.

    2017-04-01

    Nanocrystalline 3C-SiC particles irradiated by neutron flux during 20 h in TRIGA Mark II light water pool type research reactor. Silicon carbide nanoparticles were analyzed by Scanning Electron Microscope (SEM) and Transmission Electron Microscopy (TEM) devices before and after neutron irradiation. The agglomeration of nanoparticles was studied comparatively before and after neutron irradiation. After neutron irradiation the amorphous layer surrounding the nanoparticles was analyzed in TEM device. Neutron irradiation defects in the 3C-SiC nanoparticles and other effects investigated by TEM device. The effect of irradiation on the crystal structure of the nanomaterial was studied by selected area electron diffraction (SAED) and electron diffraction patterns (EDP) analysis.

  15. Single-Crystalline 3C-SiC anodically Bonded onto Glass: An Excellent Platform for High-Temperature Electronics and Bioapplications.

    Science.gov (United States)

    Phan, Hoang-Phuong; Cheng, Han-Hao; Dinh, Toan; Wood, Barry; Nguyen, Tuan-Khoa; Mu, Fengwen; Kamble, Harshad; Vadivelu, Raja; Walker, Glenn; Hold, Leonie; Iacopi, Alan; Haylock, Ben; Dao, Dzung Viet; Lobino, Mirko; Suga, Tadatomo; Nguyen, Nam-Trung

    2017-08-23

    Single-crystal cubic silicon carbide has attracted great attention for MEMS and electronic devices. However, current leakage at the SiC/Si junction at high temperatures and visible-light absorption of the Si substrate are main obstacles hindering the use of the platform in a broad range of applications. To solve these bottlenecks, we present a new platform of single crystal SiC on an electrically insulating and transparent substrate using an anodic bonding process. The SiC thin film was prepared on a 150 mm Si with a surface roughness of 7 nm using LPCVD. The SiC/Si wafer was bonded to a glass substrate and then the Si layer was completely removed through wafer polishing and wet etching. The bonded SiC/glass samples show a sharp bonding interface of less than 15 nm characterized using deep profile X-ray photoelectron spectroscopy, a strong bonding strength of approximately 20 MPa measured from the pulling test, and relatively high optical transparency in the visible range. The transferred SiC film also exhibited good conductivity and a relatively high temperature coefficient of resistance varying from -12 000 to -20 000 ppm/K, which is desirable for thermal sensors. The biocompatibility of SiC/glass was also confirmed through mouse 3T3 fibroblasts cell-culturing experiments. Taking advantage of the superior electrical properties and biocompatibility of SiC, the developed SiC-on-glass platform offers unprecedented potentials for high-temperature electronics as well as bioapplications.

  16. Crystalline silicon cell performance at low light intensities

    NARCIS (Netherlands)

    Reich, N.H.|info:eu-repo/dai/nl/30483453X; van Sark, W.G.J.H.M.|info:eu-repo/dai/nl/074628526; Alsema, E.A.|info:eu-repo/dai/nl/073416258; Lof, R.W.; Schropp, R.E.I.|info:eu-repo/dai/nl/072502584; Sinke, W.C.|info:eu-repo/dai/nl/071641009; Turkenburg, W.C.|info:eu-repo/dai/nl/073416355

    2009-01-01

    Measured and modelled JV characteristics of crystalline silicon cells below one sun intensity have been investigated. First, the JV characteristics were measured between 3 and 1000 W/m2 at 6 light levels for 41 industrially produced mono- and multi-crystalline cells from 8 manufacturers, and at 29 i

  17. Sub-amorphous thermal conductivity in ultrathin crystalline silicon nanotubes.

    Science.gov (United States)

    Wingert, Matthew C; Kwon, Soonshin; Hu, Ming; Poulikakos, Dimos; Xiang, Jie; Chen, Renkun

    2015-04-08

    Thermal transport behavior in nanostructures has become increasingly important for understanding and designing next generation electronic and energy devices. This has fueled vibrant research targeting both the causes and ability to induce extraordinary reductions of thermal conductivity in crystalline materials, which has predominantly been achieved by understanding that the phonon mean free path (MFP) is limited by the characteristic size of crystalline nanostructures, known as the boundary scattering or Casimir limit. Herein, by using a highly sensitive measurement system, we show that crystalline Si (c-Si) nanotubes (NTs) with shell thickness as thin as ∼5 nm exhibit a low thermal conductivity of ∼1.1 W m(-1) K(-1). Importantly, this value is lower than the apparent boundary scattering limit and is even about 30% lower than the measured value for amorphous Si (a-Si) NTs with similar geometries. This finding diverges from the prevailing general notion that amorphous materials represent the lower limit of thermal transport but can be explained by the strong elastic softening effect observed in the c-Si NTs, measured as a 6-fold reduction in Young's modulus compared to bulk Si and nearly half that of the a-Si NTs. These results illustrate the potent prospect of employing the elastic softening effect to engineer lower than amorphous, or subamorphous, thermal conductivity in ultrathin crystalline nanostructures.

  18. 76 FR 81914 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2011-12-29

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... of Commerce (the Department) initiated the countervailing duty investigation of crystalline silicon..., the preliminary determination is due no later than January 12, 2012. \\1\\ See Crystalline...

  19. 77 FR 37877 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-06-25

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... determination in the antidumping duty investigation of crystalline silicon photovoltaic cells, whether or not... (202) 482-4406, respectively. Correction In the Federal Register notice Crystalline...

  20. Enhancing crystalline silicon solar cell efficiency with SixGe1-x layers

    Science.gov (United States)

    Ali, Adnan; Cheow, S. L.; Azhari, A. W.; Sopian, K.; Zaidi, Saleem H.

    Crystalline silicon (c-Si) solar cell represents a cost effective, environment-friendly, and proven renewable energy resource. Industrially manufacturing of c-Si solar has now matured in terms of efficiency and cost. Continuing cost-effective efficiency enhancement requires transition towards thinner wafers in near term and thin-films in the long term. Successful implementation of either of these alternatives must address intrinsic optical absorption limitation of Si. Bandgap engineering through integration with SixGe1-x layers offers an attractive, inexpensive option. With the help of PC1D software, role of SixGe1-x layers in conventional c-Si solar cells has been intensively investigated in both wafer and thin film configurations by varying Ge concentration, thickness, and placement. In wafer configuration, increase in Ge concentration leads to enhanced absorption through bandgap broadening with an efficiency enhancement of 8% for Ge concentrations of less than 20%. At higher Ge concentrations, despite enhanced optical absorption, efficiency is reduced due to substantial lowering of open-circuit voltage. In 5-25-μm thickness, thin-film solar cell configurations, efficiency gain in excess of 30% is achievable. Therefore, SixGe1-x based thin-film solar cells with an order of magnitude reduction in costly Si material are ideally-suited both in terms of high efficiency and cost. Recent research has demonstrated significant improvement in epitaxially grown SixGe1-x layers on nanostructured Si substrates, thereby enhancing potential of this approach for next generation of c-Si based photovoltaics.

  1. Photocarrier radiometry for predicting the degradation of electrical parameters of monocrystalline silicon (c-Si) solar cell irradiated by 100 KeV proton beams

    Energy Technology Data Exchange (ETDEWEB)

    Song, P. [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001 (China); Liu, J.Y., E-mail: ljywlj@hit.edu.cn [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001 (China); State Key Laboratory of Robotics and System (HIT), Harbin 150001 (China); Yuan, H.M.; Oliullah, Md.; Wang, F. [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001 (China); Wang, Y., E-mail: songpengkevin@126.com [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001 (China); State Key Laboratory of Robotics and System (HIT), Harbin 150001 (China)

    2016-09-15

    In this study, the monocrystalline silicon (c-Si) solar cell irradiated by 100 KeV proton beams at various fluences is investigated. A one-dimensional two-layer carrier density wave model has been developed to estimate the minority carrier lifetime of n-region and p-region of the non-irradiated c-Si solar cell by best fitting with the experimental photocarrier radiometry (PCR) signal (the amplitude and the phase). Furthermore, the lifetime is used to determine the initial defect density of the quasi-neutral region (QNR) of the solar cell to predict its I–V characteristics. The theoretically predicted short-circuit current density (J{sub sc}), and open-circuit voltage (V{sub oc}) of the non-irradiated samples are in good agreement with experiment. Then a three-region defect distribution model for the c-Si solar cell irradiated by proton beams is carried out to describe the defect density distribution according to Monte Carlo simulation results and the initial defect density of the non-irradiated sample. Finally, we find that the electrical measurements of J{sub sc} and V{sub oc} of the solar cells irradiated at different fluences using 100 KeV proton beams are consistent with the PCR predicting results.

  2. On Ultrafast Photoconductivity Dynamics and Crystallinity of Black Silicon

    DEFF Research Database (Denmark)

    Porte, Hendrik Pieter; Turchinovich, Dmitry; Persheyev, Saydulla;

    2013-01-01

    We investigate the carrier dynamics of thin films of black silicon, amorphous hydrogenated silicon which under laser annealing forms a microstructured surface with extremely high broadband optical absorption. We use Raman spectroscopy to determine the degree of crystallinity of the annealed...... surfaces, and investigate the dependence on crystallinity and fabrication method of the photoconductivity. Time-resolved THz spectroscopy is used to determine the evolution of the carrier scattering time and confinement of carriers on the picosecond time scale. We conclude that a fabrication method...... with high energy leading edge of the annealing laser results in black silicon with the largest photon-to-electron conversion efficiency, largest mobility, and longest carrier lifetime....

  3. Surface passivation of c-Si for silicon heterojunction solar cells using high-pressure hydrogen diluted plasmas

    Directory of Open Access Journals (Sweden)

    Dimitrios Deligiannis

    2015-09-01

    Full Text Available In this work we demonstrate excellent c-Si surface passivation by depositing a-Si:H in the high-pressure and high hydrogen dilution regime. By using high hydrogen dilution of the precursor gases during deposition the hydrogen content of the layers is sufficiently increased, while the void fraction is reduced, resulting in dense material. Results show a strong dependence of the lifetime on the substrate temperature and a weaker dependence on the hydrogen dilution. After applying a post-deposition annealing step on the samples equilibration of the lifetime occurs independent of the initial nanostructure.

  4. Laterally inherently thin amorphous-crystalline silicon heterojunction photovoltaic cell

    Science.gov (United States)

    Chowdhury, Zahidur R.; Kherani, Nazir P.

    2014-12-01

    This article reports on an amorphous-crystalline silicon heterojunction photovoltaic cell concept wherein the heterojunction regions are laterally narrow and distributed amidst a backdrop of well-passivated crystalline silicon surface. The localized amorphous-crystalline silicon heterojunctions consisting of the laterally thin emitter and back-surface field regions are precisely aligned under the metal grid-lines and bus-bars while the remaining crystalline silicon surface is passivated using the recently proposed facile grown native oxide-plasma enhanced chemical vapour deposited silicon nitride passivation scheme. The proposed cell concept mitigates parasitic optical absorption losses by relegating amorphous silicon to beneath the shadowed metallized regions and by using optically transparent passivation layer. A photovoltaic conversion efficiency of 13.6% is obtained for an untextured proof-of-concept cell illuminated under AM 1.5 global spectrum; the specific cell performance parameters are VOC of 666 mV, JSC of 29.5 mA-cm-2, and fill-factor of 69.3%. Reduced parasitic absorption, predominantly in the shorter wavelength range, is confirmed with external quantum efficiency measurement.

  5. Simulation calculations of efficiencies and silicon consumption for CH3NH3PbI3-x-y Br x Cl y /crystalline silicon tandem solar cells

    Science.gov (United States)

    Zhang, Lili; Xie, Ziang; Tian, Fuyang; Qin, Guogang

    2017-04-01

    Much attention has been paid to two-subcell tandem solar cells (TSCs) with crystalline silicon (c-Si) as the bottom cell (TSC-Si). Previous works have pointed out that the optimal band gap, E g, of the top cell material for a TSC-Si is around 1.75 eV. With a tunable E g and better stability than MAPbI3 (MA  =  CH3NH3), MAPbI3-x-y Br x Cl y is a promising candidate for the top cell material of a TSC-Si. In this work, calculations concerning the E g, refractive index and extinction coefficient of MAPbI3-x-y Br x Cl y are performed using first-principles calculations including the spin-orbit coupling (SOC) effect. MAPbI3-x-y Br x Cl y with five sets of x and y, which have a E g around 1.75 eV, are obtained. On this basis, absorption of the perovskite top cell is calculated applying the Lambert-Beer model (LBM) and the transfer matrix model (TMM), respectively. Considering the Auger recombination in the c-Si bottom cell and radiation coupling between the two subcells, the efficiencies for MAPbI3-x-y Br x Cl y /c-Si TSCs with the five sets of x and y are calculated. Among them, the MAPbI2.375Br0.5Cl0.125/c-Si TSC achieves the highest efficiency of 35.1% with a 440 nm thick top cell and 50 µm thick c-Si when applying the LBM. When applying the TMM, the highest efficiency of 32.5% is predicted with a 580 nm thick MAPbI2.375Br0.5Cl0.125 top cell and 50 µm thick c-Si. Compared with the limiting efficiency of 27.1% for a 190 µm thick c-Si single junction solar cell (SC), the MAPbI2.375Br0.5Cl0.125/c-Si TSC shows a superior performance of high efficiency and low c-Si consumption.

  6. Band Discontinuities in Gallium Phosphide/Crystalline Silicon Heterojunctions Studied by Internal Photoemission

    Science.gov (United States)

    Sakata, Isao; Kawanami, Hitoshi

    2008-09-01

    We measured the band lineup of gallium phosphide (GaP) on crystalline silicon (c-Si) heterojunctions (HJs) by using internal photoemission (IPE), where the heterojunctions were prepared by using solid-source molecular beam epitaxy. It was found that the conduction-band and valence-band discontinuities, denoted by ΔEc and ΔEv, are 0.09+/-0.01 and 1.05+/-0.01 eV, respectively. By performing measurements on samples with different GaP layer thicknesses, we clarified that ΔEv of the present GaP-on-Si HJs is not affected by strain normal to the growth direction. The values of ΔEc and ΔEv obtained for the GaP-on-Si HJs are significantly different from those reported for thin Si-on-GaP HJs, and the implications of this discrepancy are briefly discussed.

  7. Low temperature boron doping into crystalline silicon by boron-containing species generated in Cat-CVD apparatus

    Energy Technology Data Exchange (ETDEWEB)

    Ohta, Tatsunori, E-mail: s1130011@jaist.ac.jp [Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292 (Japan); CREST, Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan); Koyama, Koichi [Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292 (Japan); CREST, Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan); Ohdaira, Keisuke [Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292 (Japan); Matsumura, Hideki [Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292 (Japan); CREST, Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan)

    2015-01-30

    We have discovered that phosphorus (P) atoms can be doped into crystalline silicon (c-Si) at temperatures below 350 °C or even at 80 °C by using species generated by catalytic cracking reaction of phosphine (PH{sub 3}) molecules with heated tungsten (W) catalyzer in Cat-CVD apparatus. As further investigation, here, we study the feasibility of low temperature doping of boron (B) atoms into c-Si by using decomposed species generated similarly from diborane (B{sub 2}H{sub 6}) molecules. Dependency of properties of doped layers on catalyzer temperature (T{sub cat}) and substrate temperature (T{sub s}) is studied by both the Van der Pauw method based on the Hall-effect measurements and secondary ion mass spectroscopy (SIMS) for B doping in addition to P doping. It is found that, similarly to P doping, the surface of n-type c-Si is converted to p-type even at T{sub s} = 80 °C for T{sub cat} over 800 °C when c-Si is exposed to B{sub 2}H{sub 6} cracked species for a few minutes, and that the heat of substrate over 300 °C is likely to help for B doping contrary to P doping.

  8. Thin-film crystalline silicon solar cells

    CERN Document Server

    Brendel, Rolf

    2011-01-01

    This introduction to the physics of silicon solar cells focuses on thin cells, while reviewing and discussing the current status of the important technology. An analysis of the spectral quantum efficiency of thin solar cells is given as well as a full set of analytical models. This is the first comprehensive treatment of light trapping techniques for the enhancement of the optical absorption in thin silicon films.

  9. Amorphous Silicon Carbide Passivating Layers to Enable Higher Processing Temperature in Crystalline Silicon Heterojunction Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu [Arizona State Univ., Mesa, AZ (United States); Holman, Zachary [Arizona State Univ., Mesa, AZ (United States)

    2015-04-06

    "Very efficient crystalline silicon (c-Si) solar cells have been demonstrated when thin layers of intrinsic and doped hydrogenated amorphous silicon (a-Si:H) are used for passivation and carrier selectivity in a heterojunction device. One limitation of this device structure is the (parasitic) absorption in the front passivation/collection a-Si:H layers; another is the degradation of the a-Si:H-based passivation upon temperature, limiting the post-processes to approximately 200°C thus restricting the contacting possibilities and potential tandem device fabrication. To alleviate these two limitations, we explore the potential of amorphous silicon carbide (a-SiC:H), a widely studied material in use in standard a-Si:H thin-film solar cells, which is known for its wider bandgap, increased hydrogen content and stronger hydrogen bonding compared to a-Si:H. We study the surface passivation of solar-grade textured n-type c-Si wafers for symmetrical stacks of 10-nm-thick intrinsic a-SiC:H with various carbon content followed by either p-doped or n-doped a-Si:H (referred to as i/p or i/n stacks). For both doping types, passivation (assessed through carrier lifetime measurements) is degraded by increasing the carbon content in the intrinsic a-SiC:H layer. Yet, this hierarchy is reversed after annealing at 350°C or more due to drastic passivation improvements upon annealing when an a-SiC:H layer is used. After annealing at 350°C, lifetimes of 0.4 ms and 2.0 ms are reported for i/p and i/n stacks, respectively, when using an intrinsic a-SiC:H layer with approximately 10% of carbon (initial lifetimes of 0.3 ms and 0.1 ms, respectively, corresponding to a 30% and 20-fold increase, respectively). For stacks of pure a-Si:H material the lifetimes degrade from 1.2 ms and 2.0 ms for i/p and i/n stacks, respectively, to less than 0.1 ms and 1.1 ms (12-fold and 2-fold decrease, respectively). For complete solar cells using pure a-Si:H i/p and i/n stacks, the open-circuit voltage (Voc

  10. Transistors using crystalline silicon devices on glass

    Science.gov (United States)

    McCarthy, A.M.

    1995-05-09

    A method is disclosed for fabricating transistors using single-crystal silicon devices on glass. This method overcomes the potential damage that may be caused to the device during high voltage bonding and employs a metal layer which may be incorporated as part of the transistor. This is accomplished such that when the bonding of the silicon wafer or substrate to the glass substrate is performed, the voltage and current pass through areas where transistors will not be fabricated. After removal of the silicon substrate, further metal may be deposited to form electrical contact or add functionality to the devices. By this method both single and gate-all-around devices may be formed. 13 figs.

  11. Organic-inorganic halide perovskite/crystalline silicon four-terminal tandem solar cells.

    Science.gov (United States)

    Löper, Philipp; Moon, Soo-Jin; de Nicolas, Sílvia Martín; Niesen, Bjoern; Ledinsky, Martin; Nicolay, Sylvain; Bailat, Julien; Yum, Jun-Ho; De Wolf, Stefaan; Ballif, Christophe

    2015-01-21

    Tandem solar cells constructed from a crystalline silicon (c-Si) bottom cell and a low-cost top cell offer a promising way to ensure long-term price reductions of photovoltaic modules. We present a four-terminal tandem solar cell consisting of a methyl ammonium lead triiodide (CH3NH3PbI3) top cell and a c-Si heterojunction bottom cell. The CH3NH3PbI3 top cell exhibits broad-band transparency owing to its design free of metallic components and yields a transmittance of >55% in the near-infrared spectral region. This allows the generation of a short-circuit current density of 13.7 mA cm(-2) in the bottom cell. The four-terminal tandem solar cell yields an efficiency of 13.4% (top cell: 6.2%, bottom cell: 7.2%), which is a gain of 1.8%abs with respect to the reference single-junction CH3NH3PbI3 solar cell with metal back contact. We employ the four-terminal tandem solar cell for a detailed investigation of the optical losses and to derive guidelines for further efficiency improvements. Based on a power loss analysis, we estimate that tandem efficiencies of ∼28% are attainable using an optically optimized system based on current technology, whereas a fully optimized, ultimate device with matched current could yield up to 31.6%.

  12. Effects of photon reabsorption phenomena in confocal micro-photoluminescence measurements in crystalline silicon

    Science.gov (United States)

    Roigé, A.; Alvarez, J.; Jaffré, A.; Desrues, T.; Muñoz, D.; Martín, I.; Alcubilla, R.; Kleider, J.-P.

    2017-02-01

    Confocal micro-photoluminescence (PL) spectroscopy has become a powerful characterization technique for studying novel photovoltaic (PV) materials and structures at the micrometer level. In this work, we present a comprehensive study about the effects and implications of photon reabsorption phenomena on confocal micro-PL measurements in crystalline silicon (c-Si), the workhorse material of the PV industry. First, supported by theoretical calculations, we show that the level of reabsorption is intrinsically linked to the selected experimental parameters, i.e., focusing lens, pinhole aperture, and excitation wavelength, as they define the spatial extension of the confocal detection volume, and therefore, the effective photon traveling distance before collection. Second, we also show that certain sample properties such as the reflectance and/or the surface recombination velocity can also have a relevant impact on reabsorption. Due to the direct relationship between the reabsorption level and the spectral line shape of the resulting PL emission signal, reabsorption phenomena play a paramount role in certain types of micro-PL measurements. This is demonstrated by means of two practical and current examples studied using confocal PL, namely, the estimation of doping densities in c-Si and the study of back-surface and/or back-contacted Si devices such as interdigitated back contact solar cells, where reabsorption processes should be taken into account for the proper interpretation and quantification of the obtained PL data.

  13. A Low Resistance Calcium/Reduced Titania Passivated Contact for High Efficiency Crystalline Silicon Solar Cells

    KAUST Repository

    Allen, Thomas G.

    2017-02-04

    Recent advances in the efficiency of crystalline silicon (c-Si) solar cells have come through the implementation of passivated contacts that simultaneously reduce recombination and resistive losses within the contact structure. In this contribution, low resistivity passivated contacts are demonstrated based on reduced titania (TiOx) contacted with the low work function metal, calcium (Ca). By using Ca as the overlying metal in the contact structure we are able to achieve a reduction in the contact resistivity of TiOx passivated contacts of up to two orders of magnitude compared to previously reported data on Al/TiOx contacts, allowing for the application of the Ca/TiOx contact to n-type c-Si solar cells with partial rear contacts. Implementing this contact structure on the cell level results in a power conversion efficiency of 21.8% where the Ca/TiOx contact comprises only ≈6% of the rear surface of the solar cell, an increase of 1.5% absolute compared to a similar device fabricated without the TiOx interlayer.

  14. Reduction of the environmental impacts in crystalline silicon module manufacturing

    NARCIS (Netherlands)

    Alsema, E.A.; de Wild-Schoten, M.J.

    2007-01-01

    In this paper we review the most important options to reduce environmental impacts of crystalline silicon modules. We investigate which are the main barriers for implementation of the measure. Finally we review which measures to reduce environmental impacts could also lead to a cost reduction. Reduc

  15. Concentration-dependent study of electronic and optical properties of c-Si and c-Si:H

    Energy Technology Data Exchange (ETDEWEB)

    Nunez-Gonzalez, R. [Departamento de Matematicas, Universidad de Sonora, C.P. 83000, Hermosillo, Sonora (Mexico); Posada-Amarillas, A. [Departamento de Investigacion en Fisica, Universidad de Sonora, Apdo. Postal 5-088 C.P. 83190, Hermosillo, Sonora (Mexico); Galvan, D.H.; Reyes-Serrato, A. [Centro de Nanociencias y Nanotecnologia, Universidad Nacional Autonoma de Mexico, Ensenada, B. C. (Mexico)

    2011-07-15

    Electronic and optical properties of crystalline silicon (c-Si) and hydrogen-doped crystalline silicon (c-Si:H) were calculated using the full-potential linearized augmented plane waves (FLAPWs) method, within the density functional theory (DFT), and the supercell method to model different hydrogen concentrations. Hydrogen was introduced in both bond-centered (BC) and tetrahedral (Td) interstitial sites to find out the most favorable configuration by searching for the lowest energy structure. The Td interstitial site yields the most stable and lowest energy structure. For several hydrogen concentrations we found that the effect of interstitial hydrogen is to introduce electronic states at the silicon band gap, turning it into a metallic system. Analysis of the calculated energy-loss function of doped silicon shows the existence of a plasmon peak at low energy of the loss spectrum, and the position of this plasmon peak is highly dependent on hydrogen concentration into silicon. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  16. Effect of TCO/μc-Si:H Interface Modification on Hydrogenated Microcrystalline Silicon Thin-Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Shin-Wei Liang

    2013-01-01

    Full Text Available The effects of H2 plasma exposure on optical, electrical, and structural properties of fluorine-doped tin oxide (FTO and AZO/FTO substrates have been investigated. With increasing the time of H2-plasma exposure, the hydrogen radical and ions penetrated through the FTO surface to form more suboxides such as SnO and metallic Sn, which was confirmed by the XPS analysis. The Sn reduction on the FTO surface can be effectively eliminated by capping the FTO with a very thin layer of sputtered aluminum-doped zinc oxide (AZO, as confirmed by the XPS analysis. By using the AZO/FTO as front TCO with the subsequent annealing, the p-i-n μc-Si:H cell exhibited a significantly enhanced JSC from 15.97 to 19.40 mA/cm2 and an increased conversion efficiency from 5.69% to 7.09%. This significant enhancement was ascribed to the effective elimination of the Sn reduction on the FTO surface by the thin AZO layer during the Si-based thin-film deposition with hydrogen-rich plasma exposure. Moreover, the subsequent annealing of the sputtered AZO could lead to less defects as well as a better interface of AZO/FTO.

  17. Improvement of μc-Si:H n–i–p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profiling

    NARCIS (Netherlands)

    Li, H. B. T.; Franken, R.H.; Stolk, R.L.; van der Werf, C.H.M.; Rath, J.K.; Schropp, R.E.I.

    2008-01-01

    The technique of maintaining a proper crystalline ratio in microcrystalline siliconc-Si:H) layers along the thickness direction by decreasing the H2 dilution ratio during deposition (H2 profiling) was introduced by several laboratories while optimizing either n–i–p or p–i–n μc-Si:H cells made by

  18. Improvement of μc-Si:H n–i–p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profiling

    NARCIS (Netherlands)

    Li, H. B. T.; Franken, R.H.; Stolk, R.L.; van der Werf, C.H.M.; Rath, J.K.; Schropp, R.E.I.

    2008-01-01

    The technique of maintaining a proper crystalline ratio in microcrystalline siliconc-Si:H) layers along the thickness direction by decreasing the H2 dilution ratio during deposition (H2 profiling) was introduced by several laboratories while optimizing either n–i–p or p–i–n μc-Si:H cells made by

  19. 76 FR 78313 - Crystalline Silicon Photovoltaic Cells and Modules From China

    Science.gov (United States)

    2011-12-16

    ... COMMISSION Crystalline Silicon Photovoltaic Cells and Modules From China Determinations On the basis of the... is materially injured by reason of imports from China of crystalline silicon photovoltaic cells and... crystalline silicon photovoltaic cells and modules from China. Accordingly, effective October 19, 2011,...

  20. 77 FR 10478 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-02-22

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... crystalline silicon photovoltaic cells, whether or not assembled into modules, from the People's Republic of..., 2012, which the Department granted.\\2\\ \\1\\ See Crystalline Silicon Photovoltaic Cells, Whether or...

  1. 77 FR 25400 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-04-30

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... in this countervailing duty (CVD) investigation of crystalline silicon photovoltaic cells, whether or... 19 CFR 351.210(b)(4)(i) and 210(i). \\1\\ See Crystalline Silicon Photovoltaic Cells, Whether or...

  2. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu; Holman, Zachary C. [School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, Arizona 85287-5706 (United States)

    2015-08-14

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer.

  3. Inkjet technology for crystalline silicon photovoltaics.

    Science.gov (United States)

    Stüwe, David; Mager, Dario; Biro, Daniel; Korvink, Jan G

    2015-01-27

    The world's ever increasing demand for energy necessitates technologies that generate electricity from inexhaustible and easily accessible energy sources. Silicon photovoltaics is a technology that can harvest the energy of sunlight. Its great characteristics have fueled research and development activities in this exciting field for many years now. One of the most important activities in the solar cell community is the investigation of alternative fabrication and structuring technologies, ideally serving both of the two main goals: device optimization and reduction of fabrication costs. Inkjet technology is practically evaluated along the whole process chain. Research activities cover many processes, such as surface texturing, emitter formation, or metallization. Furthermore, the inkjet technology itself is manifold as well. It can be used to apply inks that serve as a functional structure, present in the final device, as mask for subsequent structuring steps, or even serve as a reactant source to activate chemical etch reactions. This article reviews investigations of inkjet-printing in the field of silicon photovoltaics. The focus is on the different inkjet processes for individual fabrication steps of a solar cell. A technological overview and suggestions about where future work will be focused on are also provided. The great variety of the investigated processes highlights the ability of the inkjet technology to find its way into many other areas of functional printing and printed electronics.

  4. Design and Testing of a C/C-SiC Nozzle Extension Manufactured via Filament Winding Technique and Adapted Liquid Silicon Infiltration

    Science.gov (United States)

    Breede, F.; Koch, D.; Frieß, M.

    2014-06-01

    Nozzle extensions made of ceramic matrix composites (CMC) have the potential to improve the performance of liquid fueled rocket engines. Gas permeability and delamination have been reported to be still critical aspects in the manufacture of CMC nozzle structures. This work shows the development and manufacture of a radiation cooled C/C-SiC nozzle for a full ceramic thrust chamber. The green body was produced via advanced wet filament winding technique using multi-angle fiber architectures which were adapted to reduce the affinity of delamination during subsequent high temperature processing steps. In order to improve the final gas-tightness additional efforts were made to adjust the carbon matrix by re-infiltration for complete conversion to a dense SiC matrix with reduced amount of residual silicon after liquid silicon infiltration process. Microstructural characterization and flaw detection were performed by CT and REM analysis. Prototype nozzle extensions were manufactured and preliminary results of the structural characterization before the hot firing tests are presented.

  5. Novel chemical cleaning of textured crystalline silicon for realizing surface recombination velocity <0.2 cm/s using passivation catalytic CVD SiN x /amorphous silicon stacked layers

    Science.gov (United States)

    Thanh Nguyen, Cong; Koyama, Koichi; Higashimine, Koichi; Terashima, Shigeki; Okamoto, Chikao; Sugiyama, Shuichiro; Ohdaira, Keisuke; Matsumura, Hideki

    2017-05-01

    In this study, the development of a novel chemical cleaning method suitable for textured surfaces of crystalline silicon (c-Si) used for solar cells is demonstrated. To remove contaminants from such textured structures, chemicals have to penetrate into their complicated fine structures. Thus, the viscosity, reaction activity, and surface tension of the chemicals are adjusted by increasing the reaction temperature or introducing a surfactant. Actually, the use of concentrated (conc.) sulfuric acid (H2SO4) of 140 °C and the introduction of methanol (CH3OH) to other chemicals contribute to the improvement of the cleaning ability in textured structures. The present cleaning method in conjunction with plasma-damage-less catalytic chemical vapor deposition (Cat-CVD), often called hot-wire CVD passivation with silicon-nitride (SiN x )/amorphous silicon (a-Si) stacked layers, also contributes to the decrease in the surface recombination velocity (SRV) of c-Si. The maximum estimated SRV (SRVmax), evaluated under the assumed absence of recombination in bulk c-Si, is less than 1.1 cm/s for textured surfaces, and the real SRV, evaluated by changing the c-Si substrate thickness, is less than 0.2 cm/s.

  6. Low temperature plasma deposition of silicon thin films: From amorphous to crystalline

    OpenAIRE

    Roca i Cabarrocas, Pere; Cariou, Romain; Labrune, Martin

    2012-01-01

    International audience; We report on the epitaxial growth of crystalline silicon films on (100) oriented crystalline silicon substrates by standard plasma enhanced chemical vapor deposition at 175 °C. Such unexpected epitaxial growth is discussed in the context of deposition processes of silicon thin films, based on silicon radicals and nanocrystals. Our results are supported by previous studies on plasma synthesis of silicon nanocrystals and point toward silicon nanocrystals being the most p...

  7. Ultra-thin crystalline silicon films produced by plasma assisted epitaxial growth on silicon wafers and their transfer to foreign substrates*

    Directory of Open Access Journals (Sweden)

    Cabarrocas P. Roca i

    2010-10-01

    Full Text Available We have developed a new process to produce ultra-thin crystalline silicon films with thicknesses in the range of 0.1 − 1 μm on flexible substrates. A crystalline silicon wafer was cleaned by SiF4 plasma exposure and without breaking vacuum, an epitaxial film was grown from SiF4, H2 and Ar gas mixtures at low substrate temperature (Tsub ≈ 200 °C in a standard RF PECVD reactor. We found that H2 dilution is a key parameter for the growth of high quality epitaxial films and modification of the structural composition of the interface with the c-Si wafer, allowing one to switch from a smooth interface at low hydrogen flow rates to a fragile one, composed of hydrogen-rich micro-cavities, at high hydrogen flow rates. This feature can be advantageously used to separate the epitaxial film from the crystalline Si wafer. As a example demonstration, we show that by depositing a metal film followed by a spin-coated polyimide layer and applying a moderate thermal treatment to the stack, the fragile interface breaks down and allows one to obtain an ultrathin crystalline wafer on the flexible polyimide support.

  8. Optimized absorption of solar radiations in nano-structured thin films of crystalline silicon via a genetic algorithm

    Science.gov (United States)

    Mayer, Alexandre; Muller, Jérôme; Herman, Aline; Deparis, Olivier

    2015-08-01

    We developed a genetic algorithm to achieve optimal absorption of solar radiation in nano-structured thin films of crystalline silicon (c-Si) for applications in photovoltaics. The device includes on the front side a periodic array of inverted pyramids, with conformal passivation layer (a-Si:H or AlOx) and anti-reflection coating (SiNx). The device also includes on the back side a passivation layer (a-Si:H) and a flat reflector (ITO and Ag). The geometrical parameters of the inverted pyramids as well as the thickness of the different layers must be adjusted in order to maximize the absorption of solar radiations in the c-Si. The genetic algorithm enables the determination of optimal solutions that lead to high performances by evaluating only a reduced number of parameter combinations. The results achieved by the genetic algorithm for a 40μm thick c-Si lead to short-circuit currents of 37 mA/cm2 when a-Si:H is used for the front-side passivation and 39.1 mA/cm2 when transparent AlOx is used instead.

  9. Optical Evaluation of the Rear Contacts of Crystalline Silicon Solar Cells by Coupled Electromagnetic and Statistical Ray-Optics Modeling

    KAUST Repository

    Dabirian, Ali

    2017-02-15

    High-efficiency crystalline silicon (c-Si) solar cells increasingly feature sophisticated electron and hole contacts aimed at minimizing electronic losses. At the rear of photovoltaic devices, such contacts—usually consisting of stacks of functional layers—offer opportunities to enhance the infrared response of the solar cells. Here, we propose an accurate and simple modeling procedure to evaluate the infrared performance of rear contacts in c-Si solar cells. Our method combines full-wave electromagnetic modeling of the rear contact with a statistical ray optics model to obtain the fraction of optical energy dissipated from the rear contact relative to that absorbed by the Si wafer. Using this technique, we study the impact of the refractive index, extinction coefficient, and thickness of the rear-passivating layer and establish basic design rules. In addition, we evaluate novel optical structures, including stratified thin films, nanoparticle composites, and conductive nanowires embedded in a low-index dielectric matrix, for integration into advanced rear contacts in c-Si photovoltaic devices. From an optical perspective, nanowire structures preserving low contact resistance appear to be the most effective approach to mitigating dissipation losses from the rear contact.

  10. Relationship between cross-linking conditions of ethylene vinyl acetate and potential induced degradation for crystalline silicon photovoltaic modules

    Science.gov (United States)

    Jonai, Sachiko; Hara, Kohjiro; Tsutsui, Yuji; Nakahama, Hidenari; Masuda, Atsushi

    2015-08-01

    In this study, we investigated the relationship in crystalline silicon (c-Si) photovoltaic (PV) modules between the cross-linking level of copolymer of ethylene and vinyl acetate (EVA) as the encapsulant and the degree of degradation due to potential induced degradation (PID) phenomenon. We used three methods for the determination of cross-linking level of EVA: xylene method, which is one of the solvent extraction methods (SEM), curing degree by differential scanning calorimetry (DSC), and viscoelastic properties by dynamic mechanical analysis (DMA). The results indicate that degradation of PV modules by PID test depends on the cross-linking level of EVA. The PV modules encapsulated by EVA with higher cross-linking level show lower degradation degree due to PID phenomenon. Also we showed that EVA with higher cross-linking level tended to be higher volume resistivity. This tendency is similar to that for electrical resistance value during the PID test. The PID test was also done by changing thickness of EVA between front cover glass and c-Si with the same cross-linking level. The PV modules encapsulated by thicker EVA between front cover glass and c-Si cell show lower degradation by PID. From these results, the PV modules encapsulated by EVA with higher cross-linking level, higher volume resistivity and increased thickness would be tolerant of PID phenomenon.

  11. A holistic view of crystalline silicon module reliability

    Energy Technology Data Exchange (ETDEWEB)

    Hanoka, J.I. [Evergreen Solar, Inc., Waltham, MA (United States)

    1995-11-01

    Several aspects of module reliability are discussed, particularly with reference to the encapsulant and its interaction with the metallization and interconnection of a module. A need to look at the module as a whole single unit is stressed. Also, the issue of a slight light degradation effect in crystalline silicon cells is discussed. A model for this is mentioned and it may well be that polycrystalline cells with dislocations may have an advantage.

  12. Crystalline-silicon reliability lessons for thin-film modules

    Science.gov (United States)

    Ross, R. G., Jr.

    1985-01-01

    The reliability of crystalline silicon modules has been brought to a high level with lifetimes approaching 20 years, and excellent industry credibility and user satisfaction. The transition from crystalline modules to thin film modules is comparable to the transition from discrete transistors to integrated circuits. New cell materials and monolithic structures will require new device processing techniques, but the package function and design will evolve to a lesser extent. Although there will be new encapsulants optimized to take advantage of the mechanical flexibility and low temperature processing features of thin films, the reliability and life degradation stresses and mechanisms will remain mostly unchanged. Key reliability technologies in common between crystalline and thin film modules include hot spot heating, galvanic and electrochemical corrosion, hail impact stresses, glass breakage, mechanical fatigue, photothermal degradation of encapsulants, operating temperature, moisture sorption, circuit design strategies, product safety issues, and the process required to achieve a reliable product from a laboratory prototype.

  13. Delineation of Crystalline Extended Defects on Multicrystalline Silicon Wafers

    Directory of Open Access Journals (Sweden)

    Mohamed Fathi

    2007-01-01

    Full Text Available We have selected Secco and Yang etch solutions for the crystalline defect delineation on multicrystalline silicon (mc-Si wafers. Following experimentations and optimization of Yang and Secco etching process parameters, we have successfully revealed crystalline extended defects on mc-Si surfaces. A specific delineation process with successive application of Yang and Secco agent on the same sample has proved the increased sensitivity of Secco etch to crystalline extended defects in mc-Si materials. The exploration of delineated mc-Si surfaces indicated that strong dislocation densities are localized mainly close to the grain boundaries and on the level of small grains in size (below 1 mm. Locally, we have observed the formation of several parallel dislocation lines, perpendicular to the grain boundaries. The overlapping of several dislocations lines has revealed particular forms for etched pits of dislocations.

  14. Mechanically flexible optically transparent porous mono-crystalline silicon substrate

    KAUST Repository

    Rojas, Jhonathan Prieto

    2012-01-01

    For the first time, we present a simple process to fabricate a thin (≥5μm), mechanically flexible, optically transparent, porous mono-crystalline silicon substrate. Relying only on reactive ion etching steps, we are able to controllably peel off a thin layer of the original substrate. This scheme is cost favorable as it uses a low-cost silicon <100> wafer and furthermore it has the potential for recycling the remaining part of the wafer that otherwise would be lost and wasted during conventional back-grinding process. Due to its porosity, it shows see-through transparency and potential for flexible membrane applications, neural probing and such. Our process can offer flexible, transparent silicon from post high-thermal budget processed device wafer to retain the high performance electronics on flexible substrates. © 2012 IEEE.

  15. Effect of Silicon Nanowire on Crystalline Silicon Solar Cell Characteristics

    Directory of Open Access Journals (Sweden)

    Zahra Ostadmahmoodi Do

    2016-06-01

    Full Text Available Nanowires (NWs are recently used in several sensor or actuator devices to improve their ordered characteristics. Silicon nanowire (Si NW is one of the most attractive one-dimensional nanostructures semiconductors because of its unique electrical and optical properties. In this paper, silicon nanowire (Si NW, is synthesized and characterized for application in photovoltaic device. Si NWs are prepared using wet chemical etching method which is commonly used as a simple and low cost method for producing nanowires of the same substrate material. The process conditions are adjusted to find the best quality of Si NWs. Morphology of Si NWs is studied using a field emission scanning electron microscopic technique. An energy dispersive X-Ray analyzer is also used to provide elemental identification and quantitative compositional information. Subsequently, Schottky type solar cell samples are fabricated on Si and Si NWs using ITO and Ag contacts. The junction properties are calculated using I-V curves in dark condition and the solar cell I-V characteristics are obtained under incident of the standardized light of AM1.5. The results for the two mentioned Schottky solar cell samples are compared and discussed. An improvement in short circuit current and efficiency of Schottky solar cell is found when Si nanowires are employed.

  16. 77 FR 4764 - Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules, From the People's...

    Science.gov (United States)

    2012-01-31

    ... International Trade Administration Crystalline Silicon Photovoltaic Cells, Whether or Not Assembled Into Modules... duty investigation of crystalline silicon photovoltaic cells, whether or not assembled into modules, ] from the People's Republic of China, to no later than February 13, 2012.\\1\\ \\1\\ See Crystalline...

  17. 77 FR 72884 - Crystalline Silicon Photovoltaic Cells and Modules From China

    Science.gov (United States)

    2012-12-06

    ... COMMISSION Crystalline Silicon Photovoltaic Cells and Modules From China Determinations On the basis of the... reason of imports of crystalline silicon photovoltaic cells and modules from China, provided for in... silicon photovoltaic cells and modules from China. Chairman Irving A. Williamson and Commissioner Dean...

  18. Behind the Nature of Titanium Oxide Excellent Surface Passivation and Carrier Selectivity of c-Si

    DEFF Research Database (Denmark)

    Plakhotnyuk, Maksym; Crovetto, Andrea; Hansen, Ole

    We present an expanded study of the passivation properties of titanium dioxide (TiO2) on p-type crystalline silicon (c-Si). We report a low surface recombination velocity (16 cm/s) for TiO2 passivation layers with a thin tunnelling oxide interlayer (SiO2 or Al2O3) on p-type crystalline silicon (c......-Si). The TiO2 films were deposited by thermal atomic layer deposition (ALD) at temperatures in the range of 80-300  ̊C using titanium tetrachloride (TiCl4) as Ti precursor and water as the oxidant. The influence of TiO2 thickness (5, 10, 20 nm), presence of additional tunneling interlayer (SiO2 or Al2O3...

  19. Effect of Interphase on Mechanical Properties of C/SiC Composites Fabricated by Liquid Silicon Infiltration%界面涂层对液相硅浸渗制备C/SiC复合材料力学性能的影响

    Institute of Scientific and Technical Information of China (English)

    刘伟; 刘荣军; 曹英斌; 杨会永

    2012-01-01

    采用化学气相沉积工艺对短切碳纤维毡体进行界面涂层改性处理后树脂浸渍裂解得到了多孔C/C预制体,再将预制体液相硅浸渗制备了C/SiC复合材料.对比了纤维有无界面涂层对C/SiC复合材料力学性能的影响,并分析了其断裂机制.结果表明,与无界面涂层改性相比,碳毡经化学气相沉积SiC涂层改性处理后制备的C/SiC复合材料的力学性能更好,强度和模量分别提高了192%和36%.界面涂层增强了纤维的抗硅化效果是C/SiC复合材料力学性能提高的主要原因,但同时复合材料也呈现出脆性断裂模式.%The chemical vapor deposition technique was adopted to fulfill the pre-treatment of chopped fiber felt, and then the C/SiC composite was fabricated by liquid silicon infiltration process from the porous C/C perform which was made by PIP process. The effects of interphase on mechanical properties of C/SiC composites and the fracture mechanism were studied. The results showed the composite derived from the C/C preform without interphase melioration exhibited poor mechanical properties. While after CVD SiC pre-treatment, the bend strength and elastic modulus increased 192% and 36% individually. CVD SiC coating enhanced the anti-siliconization of carbon fibers, which was the main reason for the excellent mechanical properties, and brittle fracture was observed in this kind of composite.

  20. Crystalline silicon solar cells with high resistivity emitter

    Science.gov (United States)

    Panek, P.; Drabczyk, K.; Zięba, P.

    2009-06-01

    The paper presents a part of research targeted at the modification of crystalline silicon solar cell production using screen-printing technology. The proposed process is based on diffusion from POCl3 resulting in emitter with a sheet resistance on the level of 70 Ω/□ and then, shaped by high temperature passivation treatment. The study was focused on a shallow emitter of high resistivity and on its influence on output electrical parameters of a solar cell. Secondary ion mass spectrometry (SIMS) has been employed for appropriate distinguishing the total donor doped profile. The solar cell parameters were characterized by current-voltage characteristics and spectral response (SR) methods. Some aspects playing a role in suitable manufacturing process were discussed. The situation in a photovoltaic industry with emphasis on silicon supply and current prices of solar cells, modules and photovoltaic (PV) systems are described. The economic and quantitative estimation of the PV world market is shortly discussed.

  1. Hydrogen passivation of multi-crystalline silicon solar cells

    Institute of Scientific and Technical Information of China (English)

    胡志华; 廖显伯; 刘祖明; 夏朝凤; 陈庭金

    2003-01-01

    The effects of hydrogen passivation on multi-crystalline silicon (mc-Si) solar cells are reported in this paper.Hydrogen plasma was generated by means of ac glow discharge in a hydrogen atmosphere. Hydrogen passivation was carried out with three different groups of mc-Si solar cells after finishing contacts. The experimental results demonstrated that the photovoltaic performances of the solar cell samples have been improved after hydrogen plasma treatment, with a relative increase in conversion efficiency up to 10.6%. A calculation modelling has been performed to interpret the experimental results using the model for analysis of microelectronic and photonic structures developed at Pennsylvania State University.

  2. Detection of Potential Induced Degradation in c-Si PV Panels Using Electrical Impedance Spectroscopy

    DEFF Research Database (Denmark)

    Oprea, Matei-lon; Spataru, Sergiu; Sera, Dezso

    This work, for the first time, investigates an Impedance Spectroscopy (IS) based method for detecting potential-induced degradation (PID) in crystalline silicon photovoltaic (c-Si PV) panels. The method has been experimentally tested on a set of panels that were confirmed to be affected by PID...... by using traditional current-voltage (I-V) characterization methods, as well as electroluminescence (EL) imaging. The results confirm the effectiveness of the new approach to detect PID in PV panels....

  3. Memory effect in MOS structures containing amorphous or crystalline silicon nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Meier, Sebastian; Brueggemann, Rudolf; Bauer, Gottfried Heinrich [Institute of Physics, Carl von Ossietzky University Oldenburg, D-26111 Oldenburg (Germany); Nedev, Nicola [Istituto de Ingenieria, Universidad Autonoma de Baja California, Benito Juarez Blvd., s/n, C.P. 21280, Mexicali, Baja California (Mexico); Manolov, Emmo; Nesheva, Diana; Levi, Zelma [Insitute of Solid State Physics, Bulgarian Academy of Science, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia (Bulgaria)

    2008-07-01

    Amorphous and crystalline silicon nanoparticles (Si-NPs) embedded in a SiO{sub 2} matrix are fabricated by thermal annealing of Metal/SiO{sub 2}/SiO{sub x}/c-Si structures (x=1.15) at 700 C or 1000 C in N{sub 2} atmosphere for 30 or 60 minutes. High frequency C-V measurements show that the samples can be charged negatively or positively by applying a positive or negative bias voltage to the gate. A memory effect, due to the Si-NPs in the SiO{sub 2} matrix, is observed. The method of measurement with open circuit between two measurements leads to the retention characteristic where the structures retain about 50% of negative charge trapped in Si-NPs for 24 hours. A second method, where the flat-band voltage is applied as bias voltage, shows shorter retention characteristics. There the Si-NPs retain 50% of their charge after 10 hours.

  4. Formation of silicon nanoislands on crystalline silicon substrates by thermal annealing of silicon rich oxide deposited by low pressure chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Yu Zhenrui [Department of Electronics, INAOE, Apartado 51, Puebla, Puebla 72000 (Mexico); Aceves-Mijares, Mariano [Department of Electronics, INAOE, Apartado 51, Puebla, Puebla 72000 (Mexico); Luna-Lopez, A [Department of Electronics, INAOE, Apartado 51, Puebla, Puebla 72000 (Mexico); Du Jinhui [College of Material Science and Chemistry Engineering, Tianjin Polytechnical University (China); Bian Dongcai [College of Material Science and Chemistry Engineering, Tianjin Polytechnical University (China)

    2006-10-14

    We report the preparation and characterization of Si nanoislands grown on a c-Si substrate by thermal annealing of silicon-rich oxide (SRO) films deposited using a conventional low pressure chemical vapour deposition (LPCVD) technique. Transmission electron microscopy revealed that a high density of Si nanoislands was formed on the surface of the c-Si substrate during thermal annealing. The nanoislands are nanocrystallites with the same crystal orientation as the substrate. The strain at the c-Si/SRO interface is probably the main reason for the nucleation of the self-assembled Si nanoislands that epitaxially grow on the c-Si substrate. The proposed method is very simple and compatible with Si integrated circuit technology.

  5. Low temperature surface passivation of crystalline silicon and its application to interdigitated back contact silicon heterojunction (ibc-shj) solar cell

    Science.gov (United States)

    Shu, Zhan

    With the absence of shading loss together with improved quality of surface passivation introduced by low temperature processed amorphous silicon crystalline silicon (a-Si:H/c-Si) heterojunction, the interdigitated back contact silicon heterojunction (IBC-SHJ) solar cell exhibits a potential for higher conversion efficiency and lower cost than a traditional front contact diffused junction solar cell. In such solar cells, the front surface passivation is of great importance to achieve both high open-circuit voltage (Voc) and short-circuit current (Jsc). Therefore, the motivation of this work is to develop a low temperature processed structure for the front surface passivation of IBC-SHJ solar cells, which must have an excellent and stable passivation quality as well as a good anti-reflection property. Four different thin film materials/structures were studied and evaluated for this purpose, namely: amorphous silicon nitride (a-SiNx:H), thick amorphous silicon film (a-Si:H), amorphous silicon/silicon nitride/silicon carbide (a-Si:H/a-SiN x:H/a-SiC:H) stack structure with an ultra-thin a-Si:H layer, and zinc sulfide (ZnS). It was demonstrated that the a-Si:H/a-SiNx:H/a-SiC:H stack surpasses other candidates due to both of its excellent surface passivation quality (SRVsolar cells using the stack structure for front surface passivation. Direct comparison shows that such low temperature deposited stack structure developed in this work achieves comparable device performance to the high temperature processed front surface passivation structure used in other high efficiency IBC solar cells. However, the lower fill factor (FF) of IBC-SHJ solar cell as compared with traditional front a-Si:H/c-Si heterojunction cell (HIT cell) greatly limits the overall performance of these devices. Two-dimensional (2D) simulations were used to comparatively model the HIT and IBC-SHJ solar cells to understand the underlying device physics which controls cell performance. The effects of a wide

  6. 77 FR 35425 - Crystalline Silicon Photovoltaic Cells and Modules From China; Scheduling of the Final Phase of...

    Science.gov (United States)

    2012-06-13

    ... silicon photovoltaic cells, and modules, laminates, and panels, consisting of crystalline silicon... COMMISSION Crystalline Silicon Photovoltaic Cells and Modules From China; Scheduling of the Final Phase of... crystalline silicon photovoltaic cells and modules, provided for in subheadings 8501.31.80, 8501.61.00,...

  7. Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen

    Energy Technology Data Exchange (ETDEWEB)

    Franta, Daniel, E-mail: franta@physics.muni.cz [Department of Physical Electronic, Faculty of Science, Masaryk University, Kotlářská 2, 61137 Brno (Czech Republic); Plasma Technologies, CEITEC — Central European Institute of Technology, Masaryk University Kamenice 5, 62500 Brno (Czech Republic); Nečas, David; Zajíčková, Lenka [Department of Physical Electronic, Faculty of Science, Masaryk University, Kotlářská 2, 61137 Brno (Czech Republic); Plasma Technologies, CEITEC — Central European Institute of Technology, Masaryk University Kamenice 5, 62500 Brno (Czech Republic); Ohlídal, Ivan [Department of Physical Electronic, Faculty of Science, Masaryk University, Kotlářská 2, 61137 Brno (Czech Republic)

    2014-11-28

    The distribution of the total transition strength, i.e. the right hand side of the integral form of Thomas–Reiche–Kuhn sum rule, into individual absorption processes is described for crystalline silicon containing interstitial oxygen. Utilization of the sum rule allows the construction of a dispersion model covering all elementary excitations from phonon absorption to core electron excitations. The dependence of transition strength of individual electronic and phonon contributions on temperature and oxygen content is described. - Highlights: • Distribution of transition strength for c-Si containing interstitial oxygen • Temperature dependence of transition strength of individual contributions • Dependence of transition strength on concentration of interstitial oxygen • Consideration of interband electronic transitions, free carriers, and phonons.

  8. Determining the Onset of Amorphization of Crystalline Silicon due to Hypervelocity Impact

    Science.gov (United States)

    Poletti, C. Shane; Bachlechner, Martina E.

    2009-03-01

    Atomistic simulations were performed to study a hypervelocity impactor striking a silicon/silicon nitride interface with varying silicon substrate thicknesses. Visualization indicates that the crystalline silicon amorphizes upon impact. The objective of the present study is to determine where the boundary between amorphous and crystalline silicon occurrs. In the analysis, the silicon substrate is separated into sixty layers and for each layer the average z displacement is determined. Our results show that the boundary between amorphous and crystalline silicon occurs between layers 20 and 22 for an impactor traveling at 5 km/s. This corresponds to a depth of approximately 32 Angstroms into the silicon. More detailed analyses reveals that the z displacement is noticeably larger for the layers that do not have a silicon atom bonded beneath them compared to the ones that do.

  9. TOPICAL REVIEW: New crystalline silicon ribbon materials for photovoltaics

    Science.gov (United States)

    Hahn, G.; Schönecker, A.

    2004-12-01

    The objective of this article is to review, in relation to photovoltaic applications, the current status of crystalline silicon ribbon technologies as an alternative to technologies based on wafers originating from ingots. Increased wafer demand, the foreseeable silicon feedstock shortage, and the need for a substantial module cost reduction are the main issues that must be faced in the booming photovoltaic market. Ribbon technologies make excellent use of silicon, as wafers are crystallized directly from the melt at the desired thickness and no kerf losses occur. Therefore, they offer a high potential for significantly reducing photovoltaic electricity costs as compared to technology based on wafers cut from ingots. However, the defect structure present in the ribbon silicon wafers can limit material quality and cell efficiency. We will review the most successful of the ribbon techniques already used in large scale production or currently in the pilot demonstration phase, with special emphasis on the defects incorporated during crystal growth. Because of the inhomogeneous distribution of defects, mapped characterization techniques have to be applied. Al and P gettering studies give an insight into the complex interaction of defects in the multicrystalline materials as the gettering efficiency is influenced by the state of the chemical bonding of the metal atoms. The most important technique for improvement of carrier lifetimes is hydrogenation, whose kinetics are strongly influenced by oxygen and carbon concentrations present in the material. The best cell efficiencies for laboratory-type (17%-18% cell area: 4 cm2) as well as industrial-type (15%-16% cell area: {\\ge } 80~{\\mathrm {cm^{2}}} ) ribbon silicon solar cells are in the same range as for standard wafers cut from ingots. A substantial cost reduction therefore seems achievable, although the most promising techniques need to be improved.

  10. Crystalline silicon cell performance at low light intensities

    Energy Technology Data Exchange (ETDEWEB)

    Reich, N.H.; van Sark, W.G.J.H.M.; Alsema, E.A.; Turkenburg, W.C. [Utrecht University, Faculty of Science, Copernicus Institute for Sustainable Development and Innovation, Department of Science, Techonology and Society, Heidelberglaan 2, 3584 CS Utrecht (Netherlands); Lof, R.W.; Schropp, R.E.I. [Utrecht University, Faculty of Science, Debye Institute for Nanomaterials Science, Nanophotonics - Physics of Device, Utrecht University, P.O. Box 80.000, 3508 TA Utrecht (Netherlands); Sinke, W.C. [Energy research Centre of the Netherlands (ECN), P.O. Box 1, 1755 ZG Petten (Netherlands)

    2009-09-15

    Measured and modelled JV characteristics of crystalline silicon cells below one sun intensity have been investigated. First, the JV characteristics were measured between 3 and 1000 W/m{sup 2} at 6 light levels for 41 industrially produced mono- and multi-crystalline cells from 8 manufacturers, and at 29 intensity levels for a single multi-crystalline silicon between 0.01 and 1000 W/m{sup 2}. Based on this experimental data, the accuracy of the following four modelling approaches was evaluated: (1) empirical fill factor expressions, (2) a purely empirical function, (3) the one-diode model and (4) the two-diode model. Results show that the fill factor expressions and the empirical function fail at low light intensities, but a new empirical equation that gives accurate fits could be derived. The accuracy of both diode models are very high. However, the accuracy depends considerably on the used diode model parameter sets. While comparing different methods to determine diode model parameter sets, the two-diode model is found to be preferred in principle: particularly its capability in accurately modelling V{sub OC} and efficiency with one and the same parameter set makes the two-diode model superior. The simulated energy yields of the 41 commercial cells as a function of irradiance intensity suggest unbiased shunt resistances larger than about 10 k{omega} cm{sup 2} may help to avoid low energy yields of cells used under predominantly low light intensities. Such cells with diode currents not larger than about 10{sup -9} A/cm{sup 2} are excellent candidates for Product Integrated PV (PIPV) appliances. (author)

  11. Multi-crystalline silicon solidification under controlled forced convection

    Science.gov (United States)

    Cablea, M.; Zaidat, K.; Gagnoud, A.; Nouri, A.; Chichignoud, G.; Delannoy, Y.

    2015-05-01

    Multi-crystalline silicon wafers have a lower production cost compared to mono-crystalline wafers. This comes at the price of reduced quality in terms of electrical properties and as a result the solar cells made from such materials have a reduced efficiency. The presence of different impurities in the bulk material plays an important role during the solidification process. The impurities are related to different defects (dislocations, grain boundaries) encountered in multi-crystalline wafers. Applying an alternative magnetic field during the solidification process has various benefits. Impurities concentration in the final ingot could be reduced, especially metallic species, due to a convective term added in the liquid that reduces the concentration of impurities in the solute boundary layer. Another aspect is the solidification interface shape that is influenced by the electromagnetic stirring. A vertical Bridgman type furnace was used in order to study the solidification process of Si under the influence of a travelling magnetic field able to induce a convective flow in the liquid. The furnace was equipped with a Bitter type three-phase electromagnet that provides the required magnetic field. A numerical model of the furnace was developed in ANSYS Fluent commercial software. This paper presents experimental and numerical results of this approach, where interface markings were performed.

  12. Optical and Electrical Effects of p-type μc-SiOx:H in Thin-Film Silicon Solar Cells on Various Front Textures

    Directory of Open Access Journals (Sweden)

    Chao Zhang

    2014-01-01

    Full Text Available p-type hydrogenated microcrystalline silicon oxide (µc-SiOx:H was developed and implemented as a contact layer in hydrogenated amorphous silicon (a-Si:H single junction solar cells. Higher transparency, sufficient electrical conductivity, low ohmic contact to sputtered ZnO:Al, and tunable refractive index make p-type µc-SiOx:H a promising alternative to the commonly used p-type hydrogenated microcrystalline silicon (µc-Si:H contact layers. In this work, p-type µc-SiOx:H layers were fabricated with a conductivity of up to 10−2 S/cm and a Raman crystallinity of above 60%. Furthermore, we present p-type µc-SiOx:H films with a broad range of optical properties (2.1 eV < band gap E04<2.8 eV and 1.6 < refractive index n<2.6. These properties can be tuned by adapting deposition parameters, for example, the CO2/SiH4 deposition gas ratio. A conversion efficiency improvement of a-Si:H solar cells is achieved by applying p-type µc-SiOx:H contact layer compared to the standard p-type µc-Si:H contact layer. As another aspect, the influence of the front side texture on a-Si:H p-i-n solar cells with different p-type contact layers, µc-Si:H and µc-SiOx:H, is investigated. Furthermore, we discuss the correlation between the decrease of Voc and the cell surface area derived from AFM measurements.

  13. Test-to-Failure of Crystalline Silicon Modules: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Hacke, P.; Terwilliger, K.; Glick, S.; Trudell, D.; Bosco, N.; Johnston, S.; Kurtz, S. R.

    2010-10-01

    Accelerated lifetime testing of five crystalline silicon module designs was carried out according to the Terrestrial Photovoltaic Module Accelerated Test-to-Failure Protocol. This protocol compares the reliability of various module constructions on a quantitative basis. The modules under test are subdivided into three accelerated lifetime testing paths: 85..deg..C/85% relative humidity with system bias, thermal cycling between ?40..deg..C and 85..deg..C, and a path that alternates between damp heat and thermal cycling. The most severe stressor is damp heat with system bias applied to simulate the voltages that modules experience when connected in an array. Positive 600 V applied to the active layer with respect to the grounded module frame accelerates corrosion of the silver grid fingers and degrades the silicon nitride antireflective coating on the cells. Dark I-V curve fitting indicates increased series resistance and saturation current around the maximum power point; however, an improvement in junction recombination characteristics is obtained. Shunt paths and cell-metallization interface failures are seen developing in the silicon cells as determined by electroluminescence, thermal imaging, and I-V curves in the case of negative 600 V bias applied to the active layer. Ability to withstand electrolytic corrosion, moisture ingress, and ion drift under system voltage bias are differentiated.

  14. Light absorption mechanism in single c-Si (core)/a-Si (shell) coaxial nanowires.

    Science.gov (United States)

    Liu, W F; Oh, J I; Shen, W Z

    2011-03-25

    We have carried out detailed investigations on the light absorption mechanism in single crystalline silicon (c-Si) (core)/amorphous Si (a-Si) (shell) coaxial nanowires (NWs). Based on the Lorenz-Mie light scattering theory, we have found that the light absorption in the coaxial NWs relies on the leaky mode resonances and that the light absorption can be optimized towards photovoltaic applications when the a-Si shell thickness is about twice the c-Si core radius. The photocurrent has been found to be enhanced up to ∼ 560% compared to c-Si NWs, and to be further enhanced up to ∼ 60% by coating the nonabsorbing dielectric shells.

  15. Optical characterization of double-side-textured silicon wafer based on photonic nanostructures for thin-wafer crystalline silicon solar cells

    Science.gov (United States)

    Tayagaki, Takeshi; Furuta, Daichi; Aonuma, Osamu; Takahashi, Isao; Hoshi, Yusuke; Kurokawa, Yasuyoshi; Usami, Noritaka

    2017-04-01

    Crystalline silicon (c-Si) wafers have found extensive use in photovoltaic applications. In this regard, to enable advanced light manipulation in thin-wafer c-Si solar cells, we demonstrate the fabrication of double-side-textured Si wafers composed of a front-surface photonic nanotexture fabricated with quantum dot arrays and a rear-surface microtexture. The addition of the rear-surface microtexture to a Si wafer with the front-surface photonic nanotexture increases the wafer’s optical absorption in the near-infrared region, thus enabling enhanced light trapping. Excitation spectroscopy reveals that the photoluminescence intensity in the Si wafer with the double-sided texture is higher than that in the Si wafer without the rear-surface microtexture, thus indicating an increase in true optical absorption in the Si wafer with the double-sided texture. Our results indicate that the double-sided textures, i.e., the front-surface photonic nanotexture and rear-surface microtexture, can effectively reduce the surface reflection loss and provide enhanced light trapping, respectively.

  16. Thin film PV standing tall side-by-side with multi-crystalline silicon: also in terms of reliability

    Science.gov (United States)

    Dhere, Neelkanth G.; Ward, Allan; Wieting, Robert; Guha, Subhendu; Dhere, Ramesh G.

    2015-09-01

    Triple junction hydrogenated amorphous silicon (a-Si:H) have shown exceptionally good reliability and durability. Cadmium telluride, CdTe PV modules have shown the lowest production cost without subsidies. Copper-indium gallium selenide sulfide (CIGS) and cadmium telluride (CdTe) cells and modules have been showing efficiencies equal or greater than those of multi-crystalline, (mx-Si), PV modules. Early generation CIGS and CdTe PV modules had a different qualification standard 61646 as compared to 61215 for crystalline silicon, (c-Si), PV modules. This, together with small vulnerability in harsh climates, was used to create doubts about their reliability. Recently CdTe and CIGS glass-to-glass modules have passed the rigorous accelerated tests, especially as long as the edge seals are not compromised. Moreover, the cumulative shipment of these modules is more than 12 GW demonstrating the customer confidence in these products. Hence it can be stated that also in terms of the reliability and durability all the thin film PV modules stand tall and compare favorably with mx-Si.

  17. Characterization of thin-film silicon materials and solar cells through numerical modeling

    NARCIS (Netherlands)

    Pieters, B.E.

    2008-01-01

    At present most commercially available solar cells are made of crystalline silicon (c-Si). The disadvantages of crystalline silicon solar cells are the high material cost and energy consumption during production. A cheaper alternative can be found in thin-film silicon solar cells. The thin-film sili

  18. The effect of light soaking on crystalline silicon surface passivation by atomic layer deposited Al2O3

    Science.gov (United States)

    Liao, Baochen; Stangl, Rolf; Mueller, Thomas; Lin, Fen; Bhatia, Charanjit S.; Hoex, Bram

    2013-01-01

    The effect of light soaking of crystalline silicon wafer lifetime samples surface passivated by thermal atomic layer deposited (ALD) Al2O3 is investigated in this paper. Contrary to other passivation materials used in solar cell applications (i.e., SiO2, SiNx), using thermal ALD Al2O3, an increase in effective carrier lifetime after light soaking under standard testing conditions is observed for both p-type (˜45%) and n-type (˜60%) FZ c-Si lifetime samples. After light soaking and storing the samples in a dark and dry environment, the effective lifetime decreases again and practically returns to the value before light soaking. The rate of lifetime decrease after light soaking is significantly slower than the rate of lifetime increase by light soaking. To investigate the underlying mechanism, corona charge experiments are carried out on p-type c-Si samples before and after light soaking. The results indicate that the negative fixed charge density Qf present in the Al2O3 films increases due to the light soaking, which results in an improved field-effect passivation. Numerical calculations also confirm that the improved field-effect passivation is the main contributor for the increased effective lifetime after light soaking. To further understand the light soaking phenomenon, a kinetic model—a charge trapping/de-trapping model—is proposed to explain the time dependent behavior of the lifetime increase/decrease observed under/after light soaking. The trap model fits the experimental results very well. The observed light enhanced passivation for ALD Al2O3 passivated c-Si is of technological relevance, because solar cell devices operate under illumination, thus an increase in solar cell efficiency due to light soaking can be expected.

  19. Reduction Bending of Thin Crystalline Silicon Solar Cells

    Institute of Scientific and Technical Information of China (English)

    SHEN Lan-xian; LIU Zu-ming; LIAO Hua; TU Jie-lei; DENG Shu-kang

    2009-01-01

    Reported are the results of reduction the bending of thin crystalline silicon solar ceils after printing and sintering of back electrode by changing the back electrode paste and adjusting the screen printing parameters without effecting the electrical properties of the cell. Theory and experiments showed that the bending of the cell is changed with its thickness of suhstrate, the thinner cell, the more serious bending. The bending of the cell is decreased with the thickness decrease of the back contact paste. The substrate with the thickness of 190μm printing with sheet aluminum paste shows a relatively lower bend compared with that of the substrate printing with ordinary aluminum paste, and the minimum bend is 0.55 mm which is reduced by52%.

  20. Simulation analysis of the effects of a back surface field on a p-a-Si:H/n-c-Si/n+-a-Si:H heterojunction solar cell

    Institute of Scientific and Technical Information of China (English)

    Hu Yuehui; Zhang Xiangwen; Qu Minghao; Wang Lifu; Zeng Tao; Xie Yaojiang

    2009-01-01

    In order to investigate the effects of a back surface field (BSF) on the performance of a p-doped amorphous silicon (p-a-Si:H)/n-doped crystalline silicon (n-c-Si) solar cell, a heterojunction solar cell with a p-a-Si:H/nc-Si/n+-a-Si:H structure was designed. An n+-a-Si:H film was deposited on the back of an n-c-Si wafer as the BSF.The photovoltaic performance of p-a-Si:H/n-c-Si/n+-a-Si:H solar cells were simulated. It was shown that the BSF of the p-a-Si:H/n-c-Si/n+-a-Si:H solar cells could effectively inhibit the decrease of the cell performance caused by interface states.

  1. In-situ optical emission spectroscopy diagnostic of plasma ignition impact on crystalline silicon passivation by a-Si:H films

    Science.gov (United States)

    Meddeb, Hosny; Bearda, Twan; Abdulraheem, Yaser; Dimassi, Wissem; Ezzaouia, Hatem; Gordon, Ivan; Szlufcik, Jozef; Poortmans, Jef

    2016-08-01

    The influence of the plasma ignition condition during PECVD deposition from a silane/hydrogen mixture on the amorphous silicon passivation of crystalline silicon surface is investigated. The changes in this process step mainly consist in varying the power density for very brief durations in between 1 s and 3 s. We find that the ignition phase contributes significantly in the film growth, especially in the a-Si:H/c-Si interface formation. In particular, the deposition rate increases with ignition power density. TEM cross-section inspection presents a rougher a-Si:H/c-Si interface with higher plasma power and thus, a tendency for nano-clusters formation caused by the crystalline nature of the substrate. In-situ plasma diagnostics reveal the gradual raise up of IHa*/ISiH* with the power density leading to worse SiH* abstraction to the surface. Whereas, time-resolved optical emission spectroscopy explains the possible recombination mechanism in the plasma due to higher-silane related reactive species (HSRS) formation via polymerization reactions. Our results point out that the ignition conditions with a rather low power for longer time give the best passivation, resulting an effective lifetime up to 9 ms.

  2. Tuning the colors of c-Si solar cells by exploiting plasmonic effects

    Science.gov (United States)

    Peharz, G.; Grosschädl, B.; Prietl, C.; Waldhauser, W.; Wenzl, F. P.

    2016-09-01

    The color of a crystalline silicon (c-Si) solar cell is mainly determined by its anti-reflective coating. This is a lambda/4 coating made from a transparent dielectric material. The thickness of the anti-reflective coating is optimized for maximal photocurrent generation, resulting in the typical blue or black colors of c-Si solar cells. However, for building-integrated photovoltaic (BiPV) applications the color of the solar cells is demanded to be tunable - ideally by a cheap and flexible coating process on standard (low cost) c-Si solar cells. Such a coating can be realized by applying plasmonic coloring which is a rapidly growing technology for high-quality color filtering and rendering for different fields of application (displays, imaging,…). In this contribution, we present results of an approach for tuning the color of standard industrial c-Si solar cells that is based on coating them with metallic nano-particles. In particular, thin films (green and brownish/red. The position of the resonance peak in the reflection spectrum was found to be almost independent from the angle of incidence. This low angular sensitivity is a clear advantage compared to alternative color tuning methods, for which additional dielectric thin films are deposited on c-Si solar cells.

  3. Influence of porous silicon formation on the performance of multi-crystalline silicon solar cells

    Indian Academy of Sciences (India)

    M Saad; M Naddaf

    2015-06-01

    The effect of formation of porous silicon on the performance of multi-crystalline silicon (mc-Si) solar cells is presented. Surface treatment of mc-Si solar cells was performed by electrochemical etching in HF-based solution. The effect of etching is viewed through scanning electron microscope (SEM) photographs that indicated the formation of a porous layer on the surface. Total reflection spectroscopy measurements on solar cells revealed reduced reflection after etching. In order to demonstrate the effect of this porous layer on the solar cell performance, illumination-dependent – characteristics and spectral response measurements were performed and analysed before and after etching. At all illumination intensities, short-circuit current density and open-circuit voltage values for the etched solar cell were higher than those before etching, whereas fill factor values were lower for the etched cell at high illumination intensities. An interpretation of these findings is presented.

  4. Excellent c-Si surface passivation by low-temperature atomic layer deposited titanium oxide

    Science.gov (United States)

    Liao, Baochen; Hoex, Bram; Aberle, Armin G.; Chi, Dongzhi; Bhatia, Charanjit S.

    2014-06-01

    In this work, we demonstrate that thermal atomic layer deposited (ALD) titanium oxide (TiOx) films are able to provide a—up to now unprecedented—level of surface passivation on undiffused low-resistivity crystalline silicon (c-Si). The surface passivation provided by the ALD TiOx films is activated by a post-deposition anneal and subsequent light soaking treatment. Ultralow effective surface recombination velocities down to 2.8 cm/s and 8.3 cm/s, respectively, are achieved on n-type and p-type float-zone c-Si wafers. Detailed analysis confirms that the TiOx films are nearly stoichiometric, have no significant level of contaminants, and are of amorphous nature. The passivation is found to be stable after storage in the dark for eight months. These results demonstrate that TiOx films are also capable of providing excellent passivation of undiffused c-Si surfaces on a comparable level to thermal silicon oxide, silicon nitride, and aluminum oxide. In addition, it is well known that TiOx has an optimal refractive index of 2.4 in the visible range for glass encapsulated solar cells, as well as a low extinction coefficient. Thus, the results presented in this work could facilitate the re-emergence of TiOx in the field of high-efficiency silicon wafer solar cells.

  5. Excellent c-Si surface passivation by low-temperature atomic layer deposited titanium oxide

    Energy Technology Data Exchange (ETDEWEB)

    Liao, Baochen, E-mail: liaobaochen@nus.edu.sg [Solar Energy Research Institute of Singapore, National University of Singapore, 7 Engineering Drive 1, Singapore 117574 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); A*STAR Institute of Materials Research and Engineering (IMRE), 3 Research Link, Singapore 117602 (Singapore); Hoex, Bram [Solar Energy Research Institute of Singapore, National University of Singapore, 7 Engineering Drive 1, Singapore 117574 (Singapore); Aberle, Armin G.; Bhatia, Charanjit S., E-mail: elebcs@nus.edu.sg [Solar Energy Research Institute of Singapore, National University of Singapore, 7 Engineering Drive 1, Singapore 117574 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Chi, Dongzhi [A*STAR Institute of Materials Research and Engineering (IMRE), 3 Research Link, Singapore 117602 (Singapore)

    2014-06-23

    In this work, we demonstrate that thermal atomic layer deposited (ALD) titanium oxide (TiO{sub x}) films are able to provide a—up to now unprecedented—level of surface passivation on undiffused low-resistivity crystalline silicon (c-Si). The surface passivation provided by the ALD TiO{sub x} films is activated by a post-deposition anneal and subsequent light soaking treatment. Ultralow effective surface recombination velocities down to 2.8 cm/s and 8.3 cm/s, respectively, are achieved on n-type and p-type float-zone c-Si wafers. Detailed analysis confirms that the TiO{sub x} films are nearly stoichiometric, have no significant level of contaminants, and are of amorphous nature. The passivation is found to be stable after storage in the dark for eight months. These results demonstrate that TiO{sub x} films are also capable of providing excellent passivation of undiffused c-Si surfaces on a comparable level to thermal silicon oxide, silicon nitride, and aluminum oxide. In addition, it is well known that TiO{sub x} has an optimal refractive index of 2.4 in the visible range for glass encapsulated solar cells, as well as a low extinction coefficient. Thus, the results presented in this work could facilitate the re-emergence of TiO{sub x} in the field of high-efficiency silicon wafer solar cells.

  6. Influnce of exposure with Xe radiation on heterojunction solar cell a-SiC/c-Si studied by impedance spectroscopy

    Science.gov (United States)

    Perný, M.; Šály, V.; Packa, J.; Mikolášek, M.; Váry, M.; Huran, J.; Hrubčín, L.; Skuratov, V. A.; Arbet, J.

    2017-04-01

    The photovoltaic efficiency of heterostructures a-SiC/c-Si may be the same or even better in comparison with conventional silicon structures when suitable adjustment of technological parameters is realized. The main advantage of heterojunction formed amorphous SiC thin film and crystalline silicon compared to standard crystalline solar cell lies in high build-in voltage and thus a high open-circuit voltage. Solar cells can be exposed to various influences of hard environment. A deterioration of properties of heterostructures (a-SiC/c-Si) due to irradiation is examined in our paper using impedance spectroscopy method. Xe ions induced damage is reflected in changes of proposed AC equivalent circuit elements. AC equivalent circuit was proposed and verified using numerical simulations. Impedance spectra were also measured at different DC bias voltages due to a more detailed understanding correlation between Xe ions induced damage and transport phenomenon in the heterostructure.

  7. High Efficiency, Low Cost Solar Cells Manufactured Using 'Silicon Ink' on Thin Crystalline Silicon Wafers

    Energy Technology Data Exchange (ETDEWEB)

    Antoniadis, H.

    2011-03-01

    Reported are the development and demonstration of a 17% efficient 25mm x 25mm crystalline Silicon solar cell and a 16% efficient 125mm x 125mm crystalline Silicon solar cell, both produced by Ink-jet printing Silicon Ink on a thin crystalline Silicon wafer. To achieve these objectives, processing approaches were developed to print the Silicon Ink in a predetermined pattern to form a high efficiency selective emitter, remove the solvents in the Silicon Ink and fuse the deposited particle Silicon films. Additionally, standard solar cell manufacturing equipment with slightly modified processes were used to complete the fabrication of the Silicon Ink high efficiency solar cells. Also reported are the development and demonstration of a 18.5% efficient 125mm x 125mm monocrystalline Silicon cell, and a 17% efficient 125mm x 125mm multicrystalline Silicon cell, by utilizing high throughput Ink-jet and screen printing technologies. To achieve these objectives, Innovalight developed new high throughput processing tools to print and fuse both p and n type particle Silicon Inks in a predetermined pat-tern applied either on the front or the back of the cell. Additionally, a customized Ink-jet and screen printing systems, coupled with customized substrate handling solution, customized printing algorithms, and a customized ink drying process, in combination with a purchased turn-key line, were used to complete the high efficiency solar cells. This development work delivered a process capable of high volume producing 18.5% efficient crystalline Silicon solar cells and enabled the Innovalight to commercialize its technology by the summer of 2010.

  8. Performance analysis of field exposed single crystalline silicon modules

    Energy Technology Data Exchange (ETDEWEB)

    Sastry, O.S.; Saurabh, Sriparn; Shil, S.K.; Pant, P.C.; Kumar, Rajesh; Kumar, Arun; Bandopadhyay, Bibek [Solar Energy Centre, Ministry of New and Renewable Energy, Block-14, CGO Complex, Lodhi Road, New Delhi - 110003 (India)

    2010-09-15

    This paper presents results on the field performance degradation of mono-crystalline silicon PV modules from 11 PV module manufacturers under identical field conditions. The modules were installed in both fixed tilt and manual tracking modes. The data were monitored using a CR23X Data logger and I-V curves were taken using SPI 240A Sun simulator. The performance parameters analyzed are V{sub oc}, I{sub sc}, P{sub max}, I{sub mp}, V{sub mp} and the fill factor, as a function of time of field exposure. Qualitative studies are made on physically visible defects such as EVA coloration, cell de-laminations, corrosion of solar cell grid, corrosion of end strip connected in the terminal box, failure of by-pass diode, detachment of the terminal box, tearing of tedlar sheet, etc. The effect of field exposure on the performance parameters indicates that the qualification standard (s) needs to be reviewed and revised if the modules are to perform for {proportional_to}20 years under actual field conditions in India. (author)

  9. Fracture of crystalline silicon nanopillars during electrochemical lithium insertion

    KAUST Repository

    Lee, S. W.

    2012-02-27

    From surface hardening of steels to doping of semiconductors, atom insertion in solids plays an important role in modifying chemical, physical, and electronic properties of materials for a variety of applications. High densities of atomic insertion in a solid can result in dramatic structural transformations and associated changes in mechanical behavior: This is particularly evident during electrochemical cycling of novel battery electrodes, such as alloying anodes, conversion oxides, and sulfur and oxygen cathodes. Silicon, which undergoes 400% volume expansion when alloying with lithium, is an extreme case and represents an excellent model system for study. Here, we show that fracture locations are highly anisotropic for lithiation of crystalline Si nanopillars and that fracture is strongly correlated with previously discovered anisotropic expansion. Contrary to earlier theoretical models based on diffusion-induced stresses where fracture is predicted to occur in the core of the pillars during lithiation, the observed cracks are present only in the amorphous lithiated shell. We also show that the critical fracture size is between about 240 and 360 nm and that it depends on the electrochemical reaction rate.

  10. Relation of lifetime to surface passivation for atomic-layer-deposited Al{sub 2}O{sub 3} on crystalline silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Cho, Young Joon [Graduate School of Energy Science and Technology, Chungnam National University, Yuseong-gu, Daejeon 305-764 (Korea, Republic of); Song, Hee Eun, E-mail: hsong@kier.re.kr [Photovoltaic Center, Korea Institute of Energy Research, Yuseong-gu, Daejeon 305-343 (Korea, Republic of); Chang, Hyo Sik, E-mail: hschang@cnu.ac.kr [Graduate School of Energy Science and Technology, Chungnam National University, Yuseong-gu, Daejeon 305-764 (Korea, Republic of)

    2015-03-15

    Highlights: • We investigated the relation of potassium contamination on Si solar wafer to lifetime. • We deposited Al{sub 2}O{sub 3} layer by atomic layer deposition (ALD) on Si solar wafer after several cleaning process. • Potassium can be left on Si surface by incomplete cleaning process and degrade the Al{sub 2}O{sub 3} passivation quality. - Abstract: We investigated the relation of potassium contamination on a crystalline silicon (c-Si) surface after potassium hydroxide (KOH) etching to the lifetime of the c-Si solar cell. Alkaline solution was employed for saw damage removal (SDR), texturing, and planarization of a textured c-Si solar wafer prior to atomic layer deposition (ALD) Al{sub 2}O{sub 3} growth. In the solar-cell manufacturing process, ALD Al{sub 2}O{sub 3} passivation is utilized to obtain higher conversion efficiency. ALD Al{sub 2}O{sub 3} shows excellent surface passivation, though minority carrier lifetime varies with cleaning conditions. In the present study, we investigated the relation of potassium contamination to lifetime in solar-cell processing. The results showed that the potassium-contaminated samples, due to incomplete cleaning of KOH, had a short lifetime, thus establishing that residual potassium can degrade Al{sub 2}O{sub 3} surface passivation.

  11. Nanostructured Dielectric Layer for Ultrathin Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Yusi Chen

    2017-01-01

    Full Text Available Nanostructures have been widely used in solar cells due to their extraordinary photon management properties. However, due to poor pn junction quality and high surface recombination velocity, typical nanostructured solar cells are not efficient compared with the traditional commercial solar cells. Here, we demonstrate a new approach to design, simulate, and fabricate whole-wafer nanostructures on dielectric layer on thin c-Si for solar cell light trapping. The optical simulation results show that the periodic nanostructure arrays on dielectric materials could suppress the reflection loss over a wide spectral range. In addition, by applying the nanostructured dielectric layer on 40 μm thin c-Si, the reflection loss is suppressed to below 5% over a wide spectra and angular range. Moreover, a c-Si solar cell with 2.9 μm ultrathin absorber layer demonstrates 32% improvement in short circuit current and 44% relative improvement in energy conversion efficiency. Our results suggest that nanostructured dielectric layer has the potential to significantly improve solar cell performance and avoid typical problems of defects and surface recombination for nanostructured solar cells, thus providing a new pathway towards realizing high-efficiency and low-cost c-Si solar cells.

  12. Threshold for permanent refractive index change in crystalline silicon by femtosecond laser irradiation

    Science.gov (United States)

    Bachman, D.; Chen, Z.; Fedosejevs, R.; Tsui, Y. Y.; Van, V.

    2016-08-01

    An optical damage threshold for crystalline silicon from single femtosecond laser pulses was determined by detecting a permanent change in the refractive index of the material. This index change could be detected with unprecedented sensitivity by measuring the resonant wavelength shift of silicon integrated optics microring resonators irradiated with femtosecond laser pulses at 400 nm and 800 nm wavelengths. The threshold for permanent index change at 400 nm wavelength was determined to be 0.053 ± 0.007 J/cm2, which agrees with previously reported threshold values for femtosecond laser modification of crystalline silicon. However, the threshold for index change at 800 nm wavelength was found to be 0.044 ± 0.005 J/cm2, which is five times lower than the previously reported threshold values for visual change on the silicon surface. The discrepancy is attributed to possible modification of the crystallinity of silicon below the melting temperature that has not been detected before.

  13. Effective interface state effects in hydrogenated amorphous-crystalline silicon heterostructures using ultraviolet laser photocarrier radiometry

    Science.gov (United States)

    Melnikov, A.; Mandelis, A.; Halliop, B.; Kherani, N. P.

    2013-12-01

    Ultraviolet photocarrier radiometry (UV-PCR) was used for the characterization of thin-film (nanolayer) intrinsic hydrogenated amorphous silicon (i-a-Si:H) on c-Si. The small absorption depth (approximately 10 nm at 355 nm laser excitation) leads to strong influence of the nanolayer parameters on the propagation and recombination of the photocarrier density wave (CDW) within the layer and the substrate. A theoretical PCR model including the presence of effective interface carrier traps was developed and used to evaluate the transport parameters of the substrate c-Si as well as those of the i-a-Si:H nanolayer. Unlike conventional optoelectronic characterization methods such as photoconductance, photovoltage, and photoluminescence, UV-PCR can be applied to more complete quantitative characterization of a-Si:H/c-Si heterojunction solar cells, including transport properties and defect structures. The quantitative results elucidate the strong effect of a front-surface passivating nanolayer on the transport properties of the entire structure as the result of effective a-Si:H/c-Si interface trap neutralization through occupation. A further dramatic improvement of those properties with the addition of a back-surface passivating nanolayer is observed and interpreted as the result of the interaction of the increased excess bulk CDW with, and more complete occupation and neutralization of, effective front interface traps.

  14. High-flux solar furnace processing of crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Tsuo, Y.S.; Pitts, J.R. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States); Menna, P. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)]|[ENEA-Centro Ricerche Fotovoltaiche, Portici 80055 (Italy); Landry, M.D. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States); Gee, J.M. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)]|[Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Ciszek, T.F. [National Renewable Energy Laboratory, Golden, Colorado, 80401 (United States)

    1997-02-01

    We studied the processing of crystalline-silicon solar cells using a 10-kW, high-flux solar furnace (HFSF). Major findings of this study include: (1) hydrogenated amorphous silicon films deposited on glass substrates can be converted to microcrystalline silicon by solid-phase crystallization in 5 seconds or less in the HFSF; (2) the presence of concentrated sunlight enhances the diffusion of phosphorus into silicon from a spin-on dopant source; (3) the combination of a porous-silicon surface layer and photo-enhanced impurity diffusion is very effective in gettering impurities from a metallurgical-grade silicon wafer or thin-layer silicon deposited using liquid-phase epitaxy; (4) a 14.1{percent}-efficient crystalline-silicon solar cell with an area of 4.6cm{sup 2} was fabricated using the HFSF for simultaneous diffusion of front n{sup +}-p and back p-p{sup +} junctions; and (5) we have shown that the HFSF can be used to texture crystalline-silicon surfaces and to anneal metal contacts printed on a silicon solar cell. {copyright} {ital 1997 American Institute of Physics.}

  15. High-flux solar furnace processing of crystalline silicon solar cells

    Science.gov (United States)

    Tsuo, Y. S.; Pitts, J. R.; Menna, P.; Landry, M. D.; Gee, J. M.; Ciszek, T. F.

    1997-02-01

    We studied the processing of crystalline-silicon solar cells using a 10-kW, high-flux solar furnace (HFSF). Major findings of this study include: (1) hydrogenated amorphous silicon films deposited on glass substrates can be converted to microcrystalline silicon by solid-phase crystallization in 5 seconds or less in the HFSF; (2) the presence of concentrated sunlight enhances the diffusion of phosphorus into silicon from a spin-on dopant source; (3) the combination of a porous-silicon surface layer and photo-enhanced impurity diffusion is very effective in gettering impurities from a metallurgical-grade silicon wafer or thin-layer silicon deposited using liquid-phase epitaxy; (4) a 14.1%-efficient crystalline-silicon solar cell with an area of 4.6 cm2 was fabricated using the HFSF for simultaneous diffusion of front n+-p and back p-p+ junctions; and (5) we have shown that the HFSF can be used to texture crystalline-silicon surfaces and to anneal metal contacts printed on a silicon solar cell.

  16. Method of forming crystalline silicon devices on glass

    Science.gov (United States)

    McCarthy, A.M.

    1995-03-21

    A method is disclosed for fabricating single-crystal silicon microelectronic components on a silicon substrate and transferring same to a glass substrate. This is achieved by utilizing conventional silicon processing techniques for fabricating components of electronic circuits and devices on bulk silicon, wherein a bulk silicon surface is prepared with epitaxial layers prior to the conventional processing. The silicon substrate is bonded to a glass substrate and the bulk silicon is removed leaving the components intact on the glass substrate surface. Subsequent standard processing completes the device and circuit manufacturing. This invention is useful in applications requiring a transparent or insulating substrate, particularly for display manufacturing. Other applications include sensors, actuators, optoelectronics, radiation hard electronics, and high temperature electronics. 7 figures.

  17. Chemical compatibility issues associated with use of SiC/SiC in advanced reactor concepts

    Energy Technology Data Exchange (ETDEWEB)

    Wilson, Dane F. [Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

    2015-09-01

    Silicon carbide/silicon carbide (SiC/SiC) composites are of interest for components that will experience high radiation fields in the High Temperature Gas Cooled Reactor (HTGR), the Very High Temperature Reactor (VHTR), the Sodium Fast Reactor (SFR), or the Fluoride-cooled High-temperature Reactor (FHR). In all of the reactor systems considered, reactions of SiC/SiC composites with the constituents of the coolant determine suitability of materials of construction. The material of interest is nuclear grade SiC/SiC composites, which consist of a SiC matrix [high-purity, chemical vapor deposition (CVD) SiC or liquid phase-sintered SiC that is crystalline beta-phase SiC containing small amounts of alumina-yttria impurity], a pyrolytic carbon interphase, and somewhat impure yet crystalline beta-phase SiC fibers. The interphase and fiber components may or may not be exposed, at least initially, to the reactor coolant. The chemical compatibility of SiC/SiC composites in the three reactor environments is highly dependent on thermodynamic stability with the pure coolant, and on reactions with impurities present in the environment including any ingress of oxygen and moisture. In general, there is a dearth of information on the performance of SiC in these environments. While there is little to no excess Si present in the new SiC/SiC composites, the reaction of Si with O2 cannot be ignored, especially for the FHR, in which environment the product, SiO2, can be readily removed by the fluoride salt. In all systems, reaction of the carbon interphase layer with oxygen is possible especially under abnormal conditions such as loss of coolant (resulting in increased temperature), and air and/ or steam ingress. A global outline of an approach to resolving SiC/SiC chemical compatibility concerns with the environments of the three reactors is presented along with ideas to quickly determine the baseline compatibility performance of SiC/SiC.

  18. mc-Si:H/c-Si solar cell prepared by PECVD

    Institute of Scientific and Technical Information of China (English)

    XU Ying; LIAO Xianbo; DIAO Hongwei; Li Xudong; ZENG Xiangbo; LIU Xiaoping; WANG Minhua; WANG Wenjing

    2006-01-01

    Hetero-junction solar cells with an mc-Si:H window layer were achieved. The open voltage is increased while short current is decreased with increasing the mc-Si:H layer's thickness of emitter layer. The highest of V oc of 597 mV has obtained. When fixed the thickness of 30 nm, changing the N type from amorphous silicon layer to micro-crystalline layer, the efficiency of the hetero-junction solar cells is increased. Although the hydrogen etching before deposition enables the c-Si substrates to become rough by AFM images, it enhances the formation of epitaxial-like micro-crystalline silicon and better parameters of solar cell can be obtained by implying this process. The best result of efficiency is 13.86% with the V oc of 549.8 mV, J sc of 32.19 mA·cm-2 and the cell's area of 1cm2.

  19. Dynamics of interstitial hydrogen molecules in crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Estreicher, S.K.; Wells, K. [Department of Physics, Texas Tech University, Lubbock, TX (United States); Fedders, P.A. [Department of Physics, Washington University, St. Louis, MO (United States); Ordejon, Pablo [Institut de Ciencia de Materiales de Barcelona, CSIC, Campus de la UAB, Bellaterra, Barcelona (Spain)

    2001-07-23

    The static and dynamic properties of interstitial H{sub 2}, HD and D{sub 2} molecules in crystalline silicon are obtained from ab initio molecular-dynamics simulations with atomic-like basis sets. The static (T=0) calculations agree with those of most other authors: the centre of mass (CM) of H{sub 2} is at the tetrahedral interstitial (T) site, the molecule is a nearly-free rotator, and the activation energy for diffusion is 0.90 eV. However, these results fail to explain a number of experimental observations, such as why H{sub 2} is infrared (IR) active, why the expected ortho/para splitting is not present, why the symmetry is C{sub 1}, why the piezospectroscopic tensors of H{sub 2} and D{sub 2} are identical or why the exposure to an H/D mix results in a single HD line which is not only at the wrong place but also much weaker than expected. In the present work, we extend the static calculations to include the constant-temperature dynamics for H{sub 2} in Si. At T>0 K, the CM of the molecule no longer remains at the T site. Instead, H{sub 2} 'bounces' off the walls of its tetrahedral cage and exchanges energy with the host crystal. The average position of the CM is away from the T site along <100>. Under uniaxial stress, the CM shifts off that axis and the molecule has C{sub 1} symmetry. The H-H stretch frequency calculated from the Fourier transform of the v-v autocorrelation function is close to the measured one. Since the potential energy experienced by H{sub 2} in Si near the T site is very flat, we argue that H{sub 2} should be a nearly free quantum mechanical rotator. Up to room temperature, only the j=0 and j=1 rotational states are occupied, H{sub 2} resembles a sphere rather than a dumbbell, the symmetry is determined by the position of the CM and HD is equivalent to DH in any symmetry. The rapid motion of the CM implies that an ortho-to-para transition will occur if a large magnetic moment is nearby. Several candidates are proposed. Since

  20. Gettering impurities from crystalline silicon by aluminum diffusion using a porous silicon layer

    Energy Technology Data Exchange (ETDEWEB)

    Khedher, N.; Hajji, M.; Bessais, B.; Ezzaouia, H.; Bennaceur, R. [Laboratoire des Applications Solaires, Institut National de Recherche Scientifique et Technique, BP. 95, Hammam Lif (Tunisia); Selmi, A. [Laboratoire de Physique des Semi-conducteurs, Faculte des Sciences de Monastir, 5000 Monastir (Tunisia)

    2005-06-01

    In this paper, we report a study on the possibility of gettering transition metal impurities from solar grade crystalline silicon (Si). Porous silicon layers were formed by the stain-etching method on both sides of the Si wafer. Aluminum diffusion was done throughout the PS layer in an infrared furnace under a (N{sub 2}/O{sub 2}) controlled atmosphere. This enables to getter eventual metal impurities towards the PS layer. The gettering effect was evaluated by measuring the majority carrier density and mobility and the minority carrier diffusion length (L{sub d}) of the Si substrate. For this purpose, Wander Pauw and Hall Effect measurements together with the Light Beam Induced Current (LBIC) technique were used. We noticed that the best gettering corresponds to a heat treatment at 850 C for 30 min; in that case an evident decrease of the majority carrier density and an enhancement of the mobility were observed. After gettering, we found an apparent improvement of the minority carrier diffusion length. These results give evidence of the effectiveness of external gettering treatments by combining (Al-PS) layer for an efficient gettering effect in solar grade monocrystalline Si. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  1. Crystalline Silicon Solar Cells with Thin Silicon Passivation Film Deposited prior to Phosphorous Diffusion

    Directory of Open Access Journals (Sweden)

    Ching-Tao Li

    2014-01-01

    Full Text Available We demonstrate the performance improvement of p-type single-crystalline silicon (sc-Si solar cells resulting from front surface passivation by a thin amorphous silicon (a-Si film deposited prior to phosphorus diffusion. The conversion efficiency was improved for the sample with an a-Si film of ~5 nm thickness deposited on the front surface prior to high-temperature phosphorus diffusion, with respect to the samples with an a-Si film deposited on the front surface after phosphorus diffusion. The improvement in conversion efficiency is 0.4% absolute with respect to a-Si film passivated cells, that is, the cells with an a-Si film deposited on the front surface after phosphorus diffusion. The new technique provided a 0.5% improvement in conversion efficiency compared to the cells without a-Si passivation. Such performance improvements result from reduced surface recombination as well as lowered contact resistance, the latter of which induces a high fill factor of the solar cell.

  2. a-Si/c-Si heterojunction solar cells on SiSiC ceramic substrates

    Institute of Scientific and Technical Information of China (English)

    LI Xudong; XU Ying; CHE Xiaoqi

    2006-01-01

    Silicon thin-film solar cells are considered to be one of the most promising cells in the future for their potential advantages, such as low cost, high efficiency, great stability, simple processing, and none-pollution. In this paper, latest progress on poly-crystalline silicon solar cells on ceramic substrates achieved by our group was reported. Rapid thermal chemical vapor deposition (RTCVD) was used to deposited poly-crystalline silicon thin films, and the grains of as-grown film were enlarged by Zone-melting Recrystallization (ZMR). As a great changein cell's structure, traditional diffused pn homojunction was replaced by a-Si/c-Si heterojunction, which lead is to distinct improvement in cell's efficiency.A conversion efficiency of 3.42% has been achieved on 1cm2 a-Si/c-Si heterojunction solar cell ( Isc =16.93 mA, Voc =310.9 mV, FF =06493, AM =1.5 G,24 ℃), while the cell with diffused homojunction only gotan efficiency of 0.6%. It indicates that a-Si emitter formed at low temperature might be more suitable for thin film cell on ceramics.

  3. Microstructure of SiC-Si-Al2O3 composites derived from silicone resin - metal aluminum filler compounds by low temperature reduction process

    Science.gov (United States)

    Narisawa, M.; Abe, Y.

    2011-06-01

    Concentrated slurry of a silicone resin with low carbon content, 3 μm aluminum particles and ethanol were prepared. After casting, addition of cross-linking agent and drying, silicone resin-aluminum composite with thick sheet form was obtained. The prepared sheet was heat-treated at 933 or 1073K with various holding times to characterize formed phases during the heat treatments. XRD patterns and FT-IR spectra revealed free Si formation and existence of Si-O-Si bond at 933K. The Si-O-Si bond, however, disappeared and silicon carbide was formed at 1073K. SEM observation indicated formation of cracks bridged with a number of tiny struts at 933K and conversion to wholly porous structure at 1073K.

  4. Random Si nanopillars for broadband antireflection in crystalline silicon solar cells

    Science.gov (United States)

    Choi, Junhee; Lee, Taek Sung; Jeong, Doo Seok; Lee, Wook Seong; Kim, Won Mok; Lee, Kyeong-Seok; Kim, Donghwan; Kim, Inho

    2016-09-01

    We demonstrate the fabrication of shallow Si nanopillar structures at a submicron scale which provides broadband antireflection for crystalline Si (c-Si) solar cells in the wavelength range of 350 nm-1100 nm. The Si random nanopillars were made by reactive ion etch (RIE) processing with thermally dewetted Sn metals as an etch mask. The diameters and coverages of the Si nanopillars were adjusted in a wide range of the nanoscale to microscale by varying the nominal thickness of the Sn metals and subsequent annealing temperatures. The height of the nanopillars was controlled by the RIE process time. The optimal size of the nanopillars, which are 340 nm in diameter and 150 nm in height, leads to the lowest average reflectance of 3.6%. We showed that the power conversion efficiency of the c-Si solar cells could be enhanced with the incorporation of optimally designed Si random nanopillars from 13.3% to 14.0%. The fabrication scheme of the Si nanostructures we propose in this study would be a cost-effective and promising light trapping technique for efficient c-Si solar cells.

  5. Optical gain and stimulated emission in periodic nanopatterned crystalline silicon.

    Science.gov (United States)

    Cloutier, Sylvain G; Kossyrev, Pavel A; Xu, Jimmy

    2005-12-01

    Persistent efforts have been made to achieve efficient light emission from silicon in the hope of extending the reach of silicon technology into fully integrated optoelectronic circuits, meeting the needs for high-bandwidth intrachip and interchip connects. Enhanced light emission from silicon is known to be theoretically possible, enabled mostly through quantum-confinement effects. Furthermore, Raman-laser conversion was demonstrated in silicon waveguides. Here we report on optical gain and stimulated emission in uniaxially nanopatterned silicon-on-insulator using a nanopore array as an etching mask. In edge-emission measurements, we observed threshold behaviour, optical gain, longitudinal cavity modes and linewidth narrowing, along with a collimated far-field pattern, all indicative of amplification and stimulated emission. The sub-bandgap 1,278 nm emission peak is attributed to A-centre mediated phononless direct recombination between trapped electrons and free holes. The controlled nanoscale silicon engineering, combined with the low material loss in this sub-bandgap spectral range and the long electron lifetime in such A-type trapping centres, gives rise to the measured optical gain and stimulated emission and provides a new pathway to enhance light emission from silicon.

  6. Effect of silicon solar cell processing parameters and crystallinity on mechanical strength

    Energy Technology Data Exchange (ETDEWEB)

    Popovich, V.A.; Yunus, A.; Janssen, M.; Richardson, I.M. [Delft University of Technology, Department of Materials Science and Engineering, Delft (Netherlands); Bennett, I.J. [Energy Research Centre of the Netherlands, Solar Energy, PV Module Technology, Petten (Netherlands)

    2011-01-15

    Silicon wafer thickness reduction without increasing the wafer strength leads to a high breakage rate during subsequent handling and processing steps. Cracking of solar cells has become one of the major sources of solar module failure and rejection. Hence, it is important to evaluate the mechanical strength of solar cells and influencing factors. The purpose of this work is to understand the fracture behavior of silicon solar cells and to provide information regarding the bending strength of the cells. Triple junctions, grain size and grain boundaries are considered to investigate the effect of crystallinity features on silicon wafer strength. Significant changes in fracture strength are found as a result of metallization morphology and crystallinity of silicon solar cells. It is observed that aluminum paste type influences the strength of the solar cells. (author)

  7. Preparation and single molecule structure of electroactive polysilane end-grafted on a crystalline silicon surface

    Science.gov (United States)

    Furukawa, Kazuaki; Ebata, Keisuke

    2000-12-01

    Electrically active polysilanes of poly(methylphenylsilane) (PMPS) and poly[bis(p-n-butylphenyl)silane] (PBPS), which are, respectively, known as a good hole transporting material and a near-ultraviolet electroluminescent material, are end-grafted directly on a crystalline silicon surface. The single polysilane molecules are clearly distinguished one from the other on the surface by means of atomic force microscopy observations. End-grafted single molecules of PMPS are observed as dots while end-grafted PBPS appear as worms extending for more than 100 nm on the crystalline silicon surface.

  8. Low-temperature deposition of crystalline silicon nitride nanoparticles by hot-wire chemical vapor deposition

    Science.gov (United States)

    Kim, Chan-Soo; Youn, Woong-Kyu; Lee, Dong-Kwon; Seol, Kwang-Soo; Hwang, Nong-Moon

    2009-07-01

    The nanocrystalline alpha silicon nitride (α-Si 3N 4) was deposited on a silicon substrate by hot-wire chemical vapor deposition at the substrate temperature of 700 °C under 4 and 40 Torr at the wire temperatures of 1430 and 1730 °C, with a gas mixture of SiH 4 and NH 3. The size and density of crystalline nanoparticles on the substrate increased with increasing wire temperature. With increasing reactor pressure, the crystallinity of α-Si 3N 4 nanoparticles increased, but the deposition rate decreased.

  9. Radicals and ions controlling by adjusting the antenna-substrate distance in a-Si:H deposition using a planar ICP for c-Si surface passivation

    Science.gov (United States)

    Zhou, H. P.; Xu, S.; Xu, M.; Xu, L. X.; Wei, D. Y.; Xiang, Y.; Xiao, S. Q.

    2017-02-01

    Being a key issue in the research and fabrication of silicon heterojunction (SHJ) solar cells, crystalline silicon (c-Si) surface passivation is theoretically and technologically intricate due to its complicate dependence on plasma characteristics, material properties, and plasma-material interactions. Here amorphous silicon (a-Si:H) grown by a planar inductively coupled plasma (ICP) reactor working under different antenna-substrate distances of d was used for the surface passivation of low-resistivity p-type c-Si. It is found that the microstructures (i.e., the crystallinity, Si-H bonding configuration etc.) and passivation function on c-Si of the deposited a-Si:H were profoundly influenced by the parameter of d, which primarily determines the types of growing precursors of SiHn/H contributing to the film growth and the interaction between the plasma and growing surface. c-Si surface passivation is analyzed in terms of the d-dependent a-Si:H properties and plasma characteristics. The controlling of radical types and ion bombardment on the growing surface through adjusting parameter d is emphasized.

  10. Reaction Front Evolution during Electrochemical Lithiation of Crystalline Silicon Nanopillars

    KAUST Repository

    Lee, Seok Woo

    2012-12-01

    The high theoretical specific capacity of Si as an anode material is attractive in lithium-ion batteries, although the issues caused by large volume changes during cycling have been a major challenge. Efforts have been devoted to understanding how diffusion-induced stresses cause fracture, but recent observations of anisotropic volume expansion in single-crystalline Si nanostructures require new theoretical considerations of expansion behavior during lithiation. Further experimental investigation is also necessary to better understand the anisotropy of the lithiation process. Here, we present a method to reveal the crystalline core of partially lithiated Si nanopillars with three different crystallographic orientations by using methanol to dissolve the Li atoms from the amorphous Li-Si alloy. The exposed crystalline cores have flat {110} surfaces at the pillar sidewalls; these surfaces represent the position of the reaction front between the crystalline core and the amorphous Li-Si alloy. It was also found that an amorphous Si structure remained on the flat surfaces of the crystalline core after dissolution of the Li, which was presumed to be caused by the accumulation of Si atoms left over from the removal of Li from the Li-Si alloy. © 2012 Wiley-VCH Verlag GmbH &Co. KGaA, Weinheim.

  11. Control of epitaxial growth at a-Si:H/c-Si heterointerface by the working pressure in PECVD

    Science.gov (United States)

    Shen, Yanjiao; Chen, Jianhui; Yang, Jing; Chen, Bingbing; Chen, Jingwei; Li, Feng; Dai, Xiuhong; Liu, Haixu; Xu, Ying; Mai, Yaohua

    2016-11-01

    The epitaxial-Si (epi-Si) growth on the crystalline Si (c-Si) wafer could be tailored by the working pressure in plasma-enhanced chemical vapor deposition (PECVD). It has been systematically confirmed that the epitaxial growth at the hydrogenated amorphous silicon (a-Si:H)/c-Si interface is suppressed at high pressure (hp) and occurs at low pressure (lp). The hp a-Si:H, as a purely amorphous layer, is incorporated in the lp-epi-Si/c-Si interface. We find that: (i) the epitaxial growth can also occur at a-Si:H coated c-Si wafer as long as this amorphous layer is thin enough; (ii) with the increase of the inserted hp layer thickness, lp epi-Si at the interface is suppressed, and the fraction of a-Si:H in the thin films increases and that of c-Si decreases, corresponding to the increasing minority carrier lifetime of the sample. Not only the epitaxial results, but also the quality of the thin films at hp also surpasses that at lp, leading to the longer minority carrier lifetime of the hp sample than the lp one although they have the same amorphous phase. Project supported by the Natural Science Foundation of Hebei Province, China (Grant No. E2015201203) and the International Society for Theoretical Chemical Physics of China (Grant No. 2015DFE62900).

  12. Effect of Subgrains on the Performance of Mono-Like Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Su Zhou

    2013-01-01

    Full Text Available The application of Czochralski (Cz monocrystalline silicon material in solar cells is limited by its high cost and serious light-induced degradation. The use of cast multicrystalline silicon is also hindered by its high dislocation densities and high surface reflectance after texturing. Mono-like crystalline silicon is a promising material because it has the advantages of both mono- and multicrystalline silicon. However, when mono-like wafers are made into cells, the efficiencies of a batch of wafers often fluctuate within a wide range of >1% (absolute. In this work, mono-like wafers are classified by a simple process and fabricated into laser doping selective emitter cells. The effect and mechanism of subgrains on the performance of mono-like crystalline silicon solar cells are studied. The results show that the efficiency of mono-like crystalline silicon solar cells significantly depends on material defects that appear as subgrains on an alkaline textured surface. These subgrains have an almost negligible effect on the optical performance, shunt resistance, and junction recombination but significantly affect the minority carrier diffusion length and quantum efficiency within a long wavelength range. Finally, an average efficiency of 18.2% is achieved on wafers with hardly any subgrain but with a small-grain band.

  13. Lowest surface recombination velocity on n-type crystalline silicon using PECVD a-Si:H/SiNx bi-layer passivation

    Science.gov (United States)

    Stepanov, Dmitri S.; Chowdhury, Zahidur R.; Kherani, Nazir P.

    2011-08-01

    Energy conversion efficiency of crystalline silicon (c-Si) solar cells manufactured on thin substrates is strongly influenced by the recombination losses of photo-generated charge carriers at the surface and in its proximity. Intrinsic hydrogenated amorphous silicon (i-a-Si:H) deposited using DC saddle-field plasma enhanced chemical vapour deposition (PECVD) at a low temperature of ~200°C reduces recombination losses of photo-generated carriers through passivation of defects at the surface. This study reports on high quality surface passivation achieved using a dual layer approach wherein a 70nm amorphous silicon nitride (SiNx) capping layer is deposited on a less than 10nm thin i-a-Si:H layer. While the a-Si:H layer is effective in passivating the interface recombination sites, SiNx is deemed to incorporate field-effect passivation, thus providing a minority carrier mirror. Additionally, SiNx layer acts as an anti-reflection coating with a low absorption coefficient in the optical frequency range of interest. The SiNx deposition conditions, known to strongly influence the passivating quality of the dual layer structure, were systematically investigated using the response surface methodology (RSM). The optimal deposition parameters obtained from the RSM study were experimentally verified to yield the lowest surface recombination velocity of 3.5 cm/s on 1-2 Ω-cm n-type FZ c-Si using a PECVD a-Si:H/SiNx bi-layer passivation stack.

  14. Wet chemical treatment of boron doped emitters on n-type (1 0 0) c-Si prior to amorphous silicon passivation

    Energy Technology Data Exchange (ETDEWEB)

    Meddeb, H., E-mail: hosny.meddeb@gmail.com [KACST-Intel Consortium Center of Excellence in Nano-manufacturing Applications (CENA), Riyadh (Saudi Arabia); IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Research and Technology Center of Energy, Photovoltaic Department, Borj-Cedria Science and Technology Park, BP 95, 2050 (Tunisia); University of Carthage, Faculty of Sciences of Bizerta (Tunisia); Bearda, T.; Recaman Payo, M.; Abdelwahab, I. [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Abdulraheem, Y. [Electrical Engineering Department, College of Engineering & Petroleum, Kuwait University, P.O. Box 5969, 13060 Safat (Kuwait); Ezzaouia, H. [Research and Technology Center of Energy, Photovoltaic Department, Borj-Cedria Science and Technology Park, BP 95, 2050 (Tunisia); Gordon, I.; Szlufcik, J. [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Poortmans, J. [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Department of Electrical Engineering (ESAT), K.U. Leuven, 3001 Leuven (Belgium); Faculty of Sciences, University of Hasselt, Martelarenlaan 42, 3500 Hasselt (Belgium)

    2015-02-15

    Highlights: • The influence of the cleaning process using different HF-based cleaning on the amorphous silicon passivation of homojunction boron doped emitters is analyzed. • The effect of boron doping level on surface characteristics after wet chemical cleaning: For heavily doped surfaces, the reduction in contact angle was less pronounced, which proves that such surfaces are more resistant to oxide formation and remain hydrophobic for a longer time. In the case of low HF concentration, XPS measurements show higher oxygen concentrations for samples with higher doping level, probably due to the incomplete removal of the native oxide. • Higher effective lifetime is achieved at lower doping for all considered different chemical pre-treatments. • A post-deposition annealing improves the passivation level yielding emitter saturation currents determined by Auger recombination in the order of 70 fA/cm{sup 2} and below. • The dominance of Auger recombination over other type of B-induced defects on lifetime quality in the case of our p+ emitter. - Abstract: The influence of the cleaning process on the amorphous silicon passivation of homojunction emitters is investigated. A significant variation in the passivation quality following different cleaning sequences is not observed, even though differences in cleaning performance are evident. These results point out the effectiveness of our cleaning treatment and provide a hydrogen termination for intrinsic amorphous silicon passivation. A post-deposition treatment improves the passivation level yielding emitter saturation currents determined by Auger recombination in the order of 70 fA/cm{sup 2} and below.

  15. Method for fabricating transistors using crystalline silicon devices on glass

    Science.gov (United States)

    McCarthy, A.M.

    1997-09-02

    A method for fabricating transistors using single-crystal silicon devices on glass. This method overcomes the potential damage that may be caused to the device during high voltage bonding and employs a metal layer which may be incorporated as part of the transistor. This is accomplished such that when the bonding of the silicon wafer or substrate to the glass substrate is performed, the voltage and current pass through areas where transistors will not be fabricated. After removal of the silicon substrate, further metal may be deposited to form electrical contact or add functionality to the devices. By this method both single and gate-all-around devices may be formed. 13 figs.

  16. Clathrates and beyond: Low-density allotropy in crystalline silicon

    Science.gov (United States)

    Beekman, Matt; Wei, Kaya; Nolas, George S.

    2016-12-01

    In its common, thermodynamically stable state, silicon adopts the same crystal structure as diamond. Although only a few alternative allotropic structures have been discovered and studied over the past six decades, advanced methods for structure prediction have recently suggested a remarkably rich low-density phase space that has only begun to be explored. The electronic properties of these low-density allotropes of silicon, predicted by first-principles calculations, indicate that these materials could offer a pathway to improving performance and reducing cost in a variety of electronic and energy-related applications. In this focus review, we provide an introduction and overview of recent theoretical and experimental results related to low-density allotropes of silicon, highlighting the significant potential these materials may have for technological applications, provided substantial challenges to their experimental preparation can be overcome.

  17. Photonic Properties of Er-Doped Crystalline Silicon

    NARCIS (Netherlands)

    Vinh, N. Q.; Ha, N. N.; T. Gregorkiewicz,

    2009-01-01

    During the last four decades, a remarkable research effort has been made to understand the physical properties of Si:Er material, as it is considered to be a promising approach towards improving the optical properties of crystalline Si. in this paper, we present a summary of the most important resul

  18. Influence of Boron doping on micro crystalline silicon growth

    Institute of Scientific and Technical Information of China (English)

    Li Xin-Li; Wang Guo; Chen Yong-Sheng; Yang Shi-E; Gu Jin-Hua; Lu Jing-Xiao; Gao Xiao-Yong; Li Rui; Jiao Yue-Chao; Gao Hai-Bo

    2011-01-01

    Microcrystalline silicon (Ftc-Si:H) thin films with and without boron doping are deposited using the radio-frequency plasmsrenhanced chemical vapour deposition method. The surface roughness evolutions of the silicon thin films are investigated using ex situ spectroscopic ellipsometry and an atomic force microscope. It is shown that the growth exponent β and the roughness exponent a are about 0.369 and 0.95 for the undoped thin film,respectively. Whereas,for the boron-doped pc-Si:H thin film,βincreases to 0.534 and a decreases to 0.46 due to the shadowing effect.

  19. ULTRATHIN SILICON MEMBRANES TO STUDY SUPERCURRENT TRANSPORT IN CRYSTALLINE SEMICONDUCTORS

    NARCIS (Netherlands)

    VANHUFFELEN, WM; DEBOER, MJ; KLAPWIJK, TM

    1991-01-01

    We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used to study supercurrent transport in semiconductor coupled weak links. The process uses a shallow BF2+ implantation, and permits easy control of membrane thickness less-than-or-equal-to 100 nm. Prelimina

  20. Enhancing the ultraviolet-visible-near infrared photovoltaic responses of crystalline-silicon solar cell by using aluminum nanoparticles

    Science.gov (United States)

    Hu, Fei; Zhou, Zhi-Quan; Ma, Lei; Zhang, Chi; Zhou, Wen-Jie; Lu, Ming

    2017-10-01

    We report to apply Al nanoparticles (NPs) to enhance the photovoltaic response of crystalline- or c-Si solar cell from the ultraviolet (UV) throughout the visible and near infrared (NIR) regimes. Al NPs were induced by solid thermal annealing and embedded in a SiO2 layer that was to passivate the front side of solar cell. Upon the excitation of surface plasmons (SPs) on the Al NPs under light illumination, an enhancement of broadband absorption of the solar cell was observed. The incorporation of Al NPs led to a relative 13.8% increase in photoelectric conversion efficiency of c-Si solar cell, and an external quantum efficiency enhancement from the UV throughout the visible and NIR regimes. The improvement of c-Si solar cell performance was attributed to both effects of absorption and scattering by SPs.

  1. 76 FR 66748 - Crystalline Silicon Photovoltaic Cells and Modules From China; Institution of Antidumping and...

    Science.gov (United States)

    2011-10-27

    ... COMMISSION Crystalline Silicon Photovoltaic Cells and Modules From China; Institution of Antidumping and... indication that an industry in the United States is materially injured or threatened with material injury, or the establishment of an industry in the United States is materially retarded, by reason of imports...

  2. Electroluminescence of a-Si/c-Si heterojunction solar cells after high energy irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Ferrara, Manuela

    2009-11-24

    The crystalline silicon as absorber material will certainly continue to dominate the market for space applications of solar cells. In the contribution under consideration the applicability of a-Si:H/c-Si heterojunction solar cells in space has been tested by the investigation of the cell modification by high energy protons and comparing the results to the degradation of homojunction crystalline silicon reference cells. The investigated solar cells have been irradiated with protons of different energies and doses. For all investigated solar cells the maximum damage happens for an energy of about 1.7 MeV and is mainly due to the decrease of the effective minority carrier diffusion length in the crystalline silicon absorber. Simulations carried out by AFORS-HET, a heterojunction simulation program, also confirmed this result. The main degradation mechanism for all types of devices is the monotonically decreasing charge carrier diffusion length in the p-type monocrystalline silicon absorber layer. For the heterojunction solar cell an enhancement of the photocurrent in the blue wavelength region has been observed but only in the case of heterojunction solar cell with intrinsic a-Si:H buffer layer. Additionally to the traditional characterization techniques the electroluminescence technique used for monitoring the modifications of the heteroluminescence technique used for monitoring the modifications of the heterointerface between amorphous silicon and crystalline silicon in solar cells after proton irradiation. A direct relation between minority carrier diffusion length and electroluminescence quantum efficiency has been observed but also details of the interface modification could be monitored by this technique.

  3. Formation of a Positive Fixed Charge at c -Si (111 )/a -Si3N3.5:H Interfaces

    Science.gov (United States)

    Hintzsche, L. E.; Fang, C. M.; Marsman, M.; Lamers, M. W. P. E.; Weeber, A. W.; Kresse, G.

    2015-06-01

    Modern electronic devices are unthinkable without the well-controlled formation of interfaces at heterostructures. These structures often involve at least one amorphous material. Modeling such interfaces poses a significant challenge, since a meaningful result can be expected only by using huge models or by drawing from many statistically independent samples. Here we report on the results of high-throughput calculations for interfaces between crystalline silicon (c -Si ) and amorphous silicon nitride (a -Si3N3.5:H ), which are omnipresent in commercially available solar cells. The findings reconcile only partly understood key features. At the interface, threefold-coordinated Si atoms are present. These are caused by the structural mismatch between the amorphous and crystalline parts. The local Fermi level of undoped c -Si lies well below that of a -Si N :H . To align the Fermi levels in the device, charge is transferred from the a -Si N :H part to the c -Si part resulting in an abundance of positively charged, threefold-coordinated Si atoms at the interface. This explains the existence of a positive, fixed charge at the interface that repels holes.

  4. COMBINED EFFECT OF MECHANICAL GROOVING AND STAIN-ETCHED SURFACE ON OPTICAL AND ELECTRICAL PROPERTIES OF CRYSTALLINE SILICON SUBSTRATES

    OpenAIRE

    AHMED ZARROUG; LOTFI DERBALI; RACHID OUERTANI; WISSEM DIMASSI; HATEM EZZAOUIA

    2014-01-01

    This paper investigates the combined effect of mechanical grooving and porous silicon (PS) on the front surface reflectance and the electronic properties of crystalline silicon substrates. Mechanical surface texturization leads to reduce the cell reflectance, enhance the light trapping and augment the carrier collection probability. PS was introduced as an efficient antireflective coating (ARC) onto the front surface of crystalline silicon solar cell. Micro-periodic V-shaped grooves were made...

  5. Threshold for permanent refractive index change in crystalline silicon by femtosecond laser irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Bachman, D., E-mail: bachman@ualberta.ca; Fedosejevs, R.; Tsui, Y. Y.; Van, V. [Electrical and Computer Engineering Department, University of Alberta, Edmonton, Alberta T6G 2V4 (Canada); Chen, Z. [Electrical and Computer Engineering Department, University of Alberta, Edmonton, Alberta T6G 2V4 (Canada); SLAC National Accelerator Laboratory, Menlo Park, California 94025 (United States)

    2016-08-29

    An optical damage threshold for crystalline silicon from single femtosecond laser pulses was determined by detecting a permanent change in the refractive index of the material. This index change could be detected with unprecedented sensitivity by measuring the resonant wavelength shift of silicon integrated optics microring resonators irradiated with femtosecond laser pulses at 400 nm and 800 nm wavelengths. The threshold for permanent index change at 400 nm wavelength was determined to be 0.053 ± 0.007 J/cm{sup 2}, which agrees with previously reported threshold values for femtosecond laser modification of crystalline silicon. However, the threshold for index change at 800 nm wavelength was found to be 0.044 ± 0.005 J/cm{sup 2}, which is five times lower than the previously reported threshold values for visual change on the silicon surface. The discrepancy is attributed to possible modification of the crystallinity of silicon below the melting temperature that has not been detected before.

  6. Graphene Quantum Dot Layers with Energy-Down-Shift Effect on Crystalline-Silicon Solar Cells.

    Science.gov (United States)

    Lee, Kyung D; Park, Myung J; Kim, Do-Yeon; Kim, Soo M; Kang, Byungjun; Kim, Seongtak; Kim, Hyunho; Lee, Hae-Seok; Kang, Yoonmook; Yoon, Sam S; Hong, Byung H; Kim, Donghwan

    2015-09-02

    Graphene quantum dot (GQD) layers were deposited as an energy-down-shift layer on crystalline-silicon solar cell surfaces by kinetic spraying of GQD suspensions. A supersonic air jet was used to accelerate the GQDs onto the surfaces. Here, we report the coating results on a silicon substrate and the GQDs' application as an energy-down-shift layer in crystalline-silicon solar cells, which enhanced the power conversion efficiency (PCE). GQD layers deposited at nozzle scan speeds of 40, 30, 20, and 10 mm/s were evaluated after they were used to fabricate crystalline-silicon solar cells; the results indicate that GQDs play an important role in increasing the optical absorptivity of the cells. The short-circuit current density was enhanced by about 2.94% (0.9 mA/cm(2)) at 30 mm/s. Compared to a reference device without a GQD energy-down-shift layer, the PCE of p-type silicon solar cells was improved by 2.7% (0.4 percentage points).

  7. Crystalline-Amorphous Core−Shell Silicon Nanowires for High Capacity and High Current Battery Electrodes

    KAUST Repository

    Cui, Li-Feng

    2009-01-14

    Silicon is an attractive alloy-type anode material for lithium ion batteries because of its highest known capacity (4200 mAh/g). However silicon\\'s large volume change upon lithium insertion and extraction, which causes pulverization and capacity fading, has limited its applications. Designing nanoscale hierarchical structures is a novel approach to address the issues associated with the large volume changes. In this letter, we introduce a core-shell design of silicon nanowires for highpower and long-life lithium battery electrodes. Silicon crystalline- amorphous core-shell nanowires were grown directly on stainless steel current collectors by a simple one-step synthesis. Amorphous Si shells instead of crystalline Si cores can be selected to be electrochemically active due to the difference of their lithiation potentials. Therefore, crystalline Si cores function as a stable mechanical support and an efficient electrical conducting pathway while amorphous shells store Li ions. We demonstrate here that these core-shell nanowires have high charge storage capacity (̃1000 mAh/g, 3 times of carbon) with ̃90% capacity retention over 100 cycles. They also show excellent electrochemical performance at high rate charging and discharging (6.8 A/g, ̃20 times of carbon at 1 h rate). © 2009 American Chemical Society.

  8. IR characterization of hydrogen in crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Stavola, M., E-mail: michael.stavola@Lehigh.ed [Department of Physics, Lehigh University, Bethlehem, PA 18015 (United States); Kleekajai, S.; Wen, L.; Peng, C. [Department of Physics, Lehigh University, Bethlehem, PA 18015 (United States); Yelundur, V.; Rohatgi, A. [School of Electrical Engineering, Georgia Institute of Technology, Atlanta, GA 30332 (United States); Carnel, L. [REC Wafer AS, NO-3908 Porsgrunn (Norway); Kalejs, J. [American Capital Energy, N. Chelmsford, MA 01863 (United States)

    2009-12-15

    Hydrogen is commonly introduced into silicon solar cells to reduce the deleterious effects of defects and to increase cell efficiency. A process that is widely used by industry to introduce hydrogen is by the post-deposition annealing of a hydrogen-rich SiN{sub x} layer that is used as an anti-reflection coating. A number of questions about this hydrogen introduction process and hydrogen's subsequent interactions with defects have proved difficult to address because of the low concentration of hydrogen that is introduced into the Si bulk. We have used the fundamental knowledge of hydrogenated defects that has been revealed by recent investigations of impurity-H complexes to develop strategies by which hydrogen in silicon can be detected by IR spectroscopy with high sensitivity. The introduction of hydrogen into Si by the post-deposition annealing of a SiN{sub x} coating has been investigated.

  9. RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

    Directory of Open Access Journals (Sweden)

    Siming Chen

    2013-01-01

    Full Text Available Aluminum oxide films were deposited on crystalline silicon substrates by reactive RF magnetron sputtering. The influences of the deposition parameters on the surface passivation, surface damage, optical properties, and composition of the films have been investigated. It is found that proper sputtering power and uniform magnetic field reduced the surface damage from the high-energy ion bombardment to the silicon wafers during the process and consequently decreased the interface trap density, resulting in the good surface passivation; relatively high refractive index of aluminum oxide film is benefic to improve the surface passivation. The negative-charged aluminum oxide film was then successfully prepared. The surface passivation performance was further improved after postannealing by formation of an SiOx interfacial layer. It is demonstrated that the reactive sputtering is an effective technique of fabricating aluminum oxide surface passivation film for low-cost high-efficiency crystalline silicon solar cells.

  10. International round-robin inter-comparison of dye-sensitized and crystalline silicon solar cells

    Science.gov (United States)

    Chen, Chia-Yuan; Ahn, Seung Kyu; Aoki, Dasiuke; Kokubo, Junichi; Yoon, Kyung Hoon; Saito, Hidenori; Lee, Kyung Sik; Magaino, Shinichi; Takagi, Katsuhiko; Lin, Ling-Chuan; Lee, Kun-Mu; Wu, Chun-Guey; Zhou, Hong; Igari, Sanekazu

    2017-02-01

    An international round-robin inter-comparison of the spectral responsivity (SR) and current-voltage (I-V) characteristics for dye-sensitized solar cells (DSCs) and crystalline silicon solar cells is reported for the first time. The crystalline silicon cells with various spectral responsivities were also calibrated by AIST to validate this round-robin activity. On the basis of the remarkable consistency in Pmax (within ±1.4% among participants) and Isc (within ±1.2% compared to the primary calibration of AIST) of the silicon specimens, the discrepancy in the SR and photovoltaic parameters of five DSCs among three national laboratories can be verified and diagnosed. Recommendations about sample packages, SR and I-V measurement methods as well as the inter-comparison protocol for improving the performance characterization of the mesoscopic DSCs are presented according to the consolidated data and the experience of the participants.

  11. Sintering of nano crystalline silicon carbide doping with aluminium nitride

    Indian Academy of Sciences (India)

    M S Datta; A K Bandyopadhyay; B Chaudhuri

    2002-04-01

    Sinterable silicon carbide powders were prepared by attrition milling and chemical processing of an acheson type -SiC. Pressureless sintering of these powders was achieved by addition of aluminium nitride together with carbon. Nearly 99% sintered density was obtained. The mechanism of sintering was studied by scanning electron microscopy and transmission electron microscopy. This study shows that the mechanism is a solid sintering process.

  12. Nanoscale triboactivity of functionalized c-Si surfaces by Fe+ ion implantation

    Science.gov (United States)

    Nunes, B.; Alves, E.; Colaço, R.

    2016-04-01

    In the present work, we present a study of the effect of Fe+ ion implantation on the tribological response at nanoscale contact lengths of crystalline silicon (c-Si) surfaces. (1 0 0) silicon wafers were implanted with Fe+ at a fluence of 2  ×  1017 cm-2, followed by annealing treatments at temperatures of 800 °C and 1000 °C. After microstructural characterization, nanoabrasive wear tests were performed with an atomic force microscope (AFM) using an AFM diamond tip with a stiff steel cantilever that enables the application of loads between 1 μN and 8 μN. After the nanowear tests, the same AFM was used to visualize and measure the worn craters. It was observed that the as-implanted samples present the poorest nanowear response, i.e. the highest wear rate, even higher than that of the unimplanted Si wafers used as a reference. Nevertheless, annealing treatments result in a measurable increase in the nanowear resistance. In this way we show that Fe+ ion implantation of c-Si, followed by the proper post-heat treatment, results in the formation of FeSi2 nanoprecipitates finely dispersed in a recrystallized matrix. This can be a valuable way of optimizing the nanotribological behavior of silicon.

  13. N-type crystalline silicon films free of amorphous silicon deposited on glass by HCl addition using hot wire chemical vapour deposition.

    Science.gov (United States)

    Chung, Yung-Bin; Park, Hyung-Ki; Lee, Sang-Hoon; Song, Jean-Ho; Hwang, Nong-Moon

    2011-09-01

    Since n-type crystalline silicon films have the electric property much better than those of hydrogenated amorphous and microcrystalline silicon films, they can enhance the performance of advanced electronic devices such as solar cells and thin film transistors (TFTs). Since the formation of amorphous silicon is unavoidable in the low temperature deposition of microcrystalline silicon on a glass substrate at temperatures less than 550 degrees C in the plasma-enhanced chemical vapour deposition and hot wire chemical vapour deposition (HWCVD), crystalline silicon films have not been deposited directly on a glass substrate but fabricated by the post treatment of amorphous silicon films. In this work, by adding the HCl gas, amorphous silicon-free n-type crystalline silicon films could be deposited directly on a glass substrate by HWCVD. The resistivity of the n-type crystalline silicon film for the flow rate ratio of [HCl]/[SiH4] = 7.5 and [PH3]/[SiH4] = 0.042 was 5.31 x 10(-4) ohms cm, which is comparable to the resistivity 1.23 x 10(-3) ohms cm of films prepared by thermal annealing of amorphous silicon films. The absence of amorphous silicon in the film could be confirmed by high resolution transmission electron microscopy.

  14. Revival of interband crystalline reflectance from nanocrystallites in porous silicon by immersion plating

    Energy Technology Data Exchange (ETDEWEB)

    Yamani, Z.; Alaql, A.; Therrien, J.; Nayfeh, O.; Nayfeh, M. [Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)

    1999-06-01

    We prepared porous silicon for which the UV reflectance (3.3{endash}6 eV) is nearly eliminated, and exhibits no features at the Si interband bulk transitions 3.3, 4.3, and 5.5 eV. Plating with a thin layer of copper is found to cause recovery of the UV bulk-like crystalline reflectance and interband resonances. This provides evidence that the loss of crystalline absorption is reversible and is not due to a permanent loss in the crystalline structure. This may relate to a recent model in which the optical activity of ultra small nanocrystallites is produced by a new Si{endash}Si crystalline configuration (or phase), distinct from but interconnected to the diamond-like configuration by a potential barrier. {copyright} {ital 1999 American Institute of Physics.}

  15. Biomimetic and plasmonic hybrid light trapping for highly efficient ultrathin crystalline silicon solar cells.

    Science.gov (United States)

    Zhang, Y; Jia, B; Gu, M

    2016-03-21

    Designing effective light-trapping structures for the insufficiently absorbed long-wavelength light in ultrathin silicon solar cells represents a key challenge to achieve low cost and highly efficient solar cells. We propose a hybrid structure based on the biomimetic silicon moth-eye structure combined with Ag nanoparticles to achieve advanced light trapping in 2 μm thick crystalline silicon solar cells approaching the Yablonovitch limit. By synergistically using the Mie resonances of the silicon moth-eye structure and the plasmonic resonances of the Ag nanoparticles, the integrated absorption enhancement achieved across the usable solar spectrum is 69% compared with the cells with the conventional light trapping design. This is significantly larger than both the silicon moth-eye structure (58%) and Ag nanoparticle (41%) individual light trapping. The generated photocurrent in the 2 μm thick silicon layer is as large as 33.4 mA/cm2, which is equivalent to that generated by a 30 μm single-pass absorption in the silicon. The research paves the way for designing highly efficient light trapping structures in ultrathin silicon solar cells.

  16. Advancements in n-Type Base Crystalline Silicon Solar Cells and Their Emergence in the Photovoltaic Industry

    Directory of Open Access Journals (Sweden)

    Atteq ur Rehman

    2013-01-01

    Full Text Available The p-type crystalline silicon wafers have occupied most of the solar cell market today. However, modules made with n-type crystalline silicon wafers are actually the most efficient modules up to date. This is because the material properties offered by n-type crystalline silicon substrates are suitable for higher efficiencies. Properties such as the absence of boron-oxygen related defects and a greater tolerance to key metal impurities by n-type crystalline silicon substrates are major factors that underline the efficiency of n-type crystalline silicon wafer modules. The bi-facial design of n-type cells with good rear-side electronic and optical properties on an industrial scale can be shaped as well. Furthermore, the development in the industrialization of solar cell designs based on n-type crystalline silicon substrates also highlights its boost in the contributions to the photovoltaic industry. In this paper, a review of various solar cell structures that can be realized on n-type crystalline silicon substrates will be given. Moreover, the current standing of solar cell technology based on n-type substrates and its contribution in photovoltaic industry will also be discussed.

  17. Advancements in n-type base crystalline silicon solar cells and their emergence in the photovoltaic industry.

    Science.gov (United States)

    ur Rehman, Atteq; Lee, Soo Hong

    2013-01-01

    The p-type crystalline silicon wafers have occupied most of the solar cell market today. However, modules made with n-type crystalline silicon wafers are actually the most efficient modules up to date. This is because the material properties offered by n-type crystalline silicon substrates are suitable for higher efficiencies. Properties such as the absence of boron-oxygen related defects and a greater tolerance to key metal impurities by n-type crystalline silicon substrates are major factors that underline the efficiency of n-type crystalline silicon wafer modules. The bi-facial design of n-type cells with good rear-side electronic and optical properties on an industrial scale can be shaped as well. Furthermore, the development in the industrialization of solar cell designs based on n-type crystalline silicon substrates also highlights its boost in the contributions to the photovoltaic industry. In this paper, a review of various solar cell structures that can be realized on n-type crystalline silicon substrates will be given. Moreover, the current standing of solar cell technology based on n-type substrates and its contribution in photovoltaic industry will also be discussed.

  18. Advancements in n-Type Base Crystalline Silicon Solar Cells and Their Emergence in the Photovoltaic Industry

    Science.gov (United States)

    ur Rehman, Atteq; Lee, Soo Hong

    2013-01-01

    The p-type crystalline silicon wafers have occupied most of the solar cell market today. However, modules made with n-type crystalline silicon wafers are actually the most efficient modules up to date. This is because the material properties offered by n-type crystalline silicon substrates are suitable for higher efficiencies. Properties such as the absence of boron-oxygen related defects and a greater tolerance to key metal impurities by n-type crystalline silicon substrates are major factors that underline the efficiency of n-type crystalline silicon wafer modules. The bi-facial design of n-type cells with good rear-side electronic and optical properties on an industrial scale can be shaped as well. Furthermore, the development in the industrialization of solar cell designs based on n-type crystalline silicon substrates also highlights its boost in the contributions to the photovoltaic industry. In this paper, a review of various solar cell structures that can be realized on n-type crystalline silicon substrates will be given. Moreover, the current standing of solar cell technology based on n-type substrates and its contribution in photovoltaic industry will also be discussed. PMID:24459433

  19. Photovoltaic solar panels of crystalline silicon: Characterization and separation.

    Science.gov (United States)

    Dias, Pablo Ribeiro; Benevit, Mariana Gonçalves; Veit, Hugo Marcelo

    2016-03-01

    Photovoltaic panels have a limited lifespan and estimates show large amounts of solar modules will be discarded as electronic waste in a near future. In order to retrieve important raw materials, reduce production costs and environmental impacts, recycling such devices is important. Initially, this article investigates which silicon photovoltaic module's components are recyclable through their characterization using X-ray fluorescence, X-ray diffraction, energy dispersion spectroscopy and atomic absorption spectroscopy. Next, different separation methods are tested to favour further recycling processes. The glass was identified as soda-lime glass, the metallic filaments were identified as tin-lead coated copper, the panel cells were made of silicon and had silver filaments attached to it and the modules' frames were identified as aluminium, all of which are recyclable. Moreover, three different components segregation methods have been studied. Mechanical milling followed by sieving was able to separate silver from copper while chemical separation using sulphuric acid was able to detach the semiconductor material. A thermo gravimetric analysis was performed to evaluate the use of a pyrolysis step prior to the component's removal. The analysis showed all polymeric fractions present degrade at 500 °C.

  20. Gettering effect in grain boundaries of multi-crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Nouri, H.; Bouaicha, M.; Ben Rabha, M.; Bessais, B. [Laboratoire de Photovoltaique, Centre de Recherches et des Technologies de l' Energie, Technopole de Borj-Cedria, BP 95, Hammam-Lif 2050 (Tunisia)

    2012-10-15

    In this work, we analyze the effect of three gettering procedures on the variation of the grain boundaries (GBs) defect density in multicrystalline silicon (mc-Si). The effective defect density (N{sup B}) was calculated using a theoretical model where we consider the potential barrier induced by the GB as being due to structural defects and impurities. Results are compared to those obtained from C-V measurements. The potential barrier was evaluated from the dark current-voltage (I-V) characteristic performed across the GB. In addition to the Rapid Thermal Annealing (RTA), we use aluminum (Al) in the first gettering procedure, in the second we use porous silicon (PS), whereas in the third one, we realize a chemical damage (grooving). Mc-Si wafers were annealed in an infrared furnace in the same conditions, at temperatures ranging from 600 C to 1000 C (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  1. Elastic behavior of amorphous-crystalline silicon nanocomposite: An atomistic view

    Science.gov (United States)

    Das, Suvankar; Dutta, Amlan

    2017-01-01

    In the context of mechanical properties, nanocomposites with homogeneous chemical composition throughout the matrix and the dispersed phase are of particular interest. In this study, the elastic moduli of amorphous-crystalline silicon nanocomposite have been estimated using atomistic simulations. A comparison with the theoretical model reveals that the elastic behavior is significantly influenced by the crystal-amorphous interphase. On observing the effect of volume-fraction of the crystalline phase, an anomalous trend for the bulk modulus is obtained. This phenomenon is attributed to the relaxation displacements of the amorphous atoms.

  2. Epitaxial growth of 3C-SiC by using C{sub 60} as a carbon source; Untersuchungen zum epitaktischen Wachstum von 3C-SiC bei Verwendung einer C{sub 60}-Kohlenstoffquelle

    Energy Technology Data Exchange (ETDEWEB)

    Schreiber, Sascha

    2006-01-15

    Within this work epitaxial 3C-SiC-films were grown on Si(001) substrates and on ion beam synthesized 3C-SiC(001) pseudo substrates. A rather new process was used which is based on the simultaneous deposition of C60 and Si. In order to set up the necessary experimental conditions an ultra-high vacuum chamber has been designed and built. A RHEED system was used to examine SiC film growth in-situ. Using the described technique 3C-SiC films were grown void-free on Si(001) substrates. Deposition rates of C60 and Si were chosen adequately to maintain a Si:C ratio of approximately one during the deposition process. It was shown that stoichiometric and epitaxial 3C-SiC growth with the characteristic relationship (001)[110]Si(001)[110]3C-SiC could be achieved. TEM investigations revealed that the grown 3C-SiC films consist of individual grains that extend from the Si substrate to the film surface. Two characteristic grain types could be identified. The correlation between structure and texture of void-free grown 3C-SiC films and film thickness was studied by X-ray diffraction (XRD). Pole figure measurements showed that thin films only contain first-order 3C-SiC twins. With higher film thickness also second-order twins are found which are located as twin lamellae in grain type 2. Improvement of polar texture with increasing film thickness couldn't be observed in the investigated range of up to 550 nm. On ion beam synthesized 3C-SiC pseudo substrates homoepitaxial 3C-SiC growth could be demonstrated for the first time by using a C{sub 60} carbon source. In respect to the crystalline quality of the grown films the surface quality of the used substrates was identified as a crucial factor. Furthermore a correlation between the ratio of deposition rates of C{sub 60} and Si and 3C-SiC film quality could be found. Under silicon-rich conditions, i.e. with a Si:C ratio of slightly greater one, homoepitaxial 3C-SiC layer-by-layer growth can be achieved. Films grown under these

  3. Sprayed and Spin-Coated Multilayer Antireflection Coating Films for Nonvacuum Processed Crystalline Silicon Solar Cells

    OpenAIRE

    Abdullah Uzum; Masashi Kuriyama; Hiroyuki Kanda; Yutaka Kimura; Kenji Tanimoto; Hidehito Fukui; Taichiro Izumi; Tomitaro Harada; Seigo Ito

    2017-01-01

    Using the simple and cost-effective methods, spin-coated ZrO2-polymer composite/spray-deposited TiO2-compact multilayer antireflection coating film was introduced. With a single TiO2-compact film on the surface of a crystalline silicon wafer, 5.3% average reflectance (the reflectance average between the wavelengths of 300 nm and 1100 nm) was observed. Reflectance decreased further down to 3.3% after forming spin-coated ZrO2 on the spray-deposited TiO2-compact film. Silicon solar cells were fa...

  4. Silanization effect on the photoluminescence characteristics of crystalline and amorphous silicon nanoparticles.

    Science.gov (United States)

    Caregnato, Paula; Dell'Arciprete, Maria Laura; Gonzalez, Mónica Cristina

    2013-09-01

    Silicon nanoparticles synthesized by two different methods were surface modified with 3-mercaptopropyltrimethoxysilane. The particles of ~2 nm size exhibit photoluminescence (PL) in the UV-Vis range of the spectrum. The most intense PL band at 430 nm with an emission lifetime of 1-2 ns is attributed to the presence of the surface defects Si-O-Si, generated after anchoring the organic molecule onto the interface. The excitation-emission matrix of this band is essentially independent of the technique of synthesis, crystalline structure, and size of the silicon nanoparticles.

  5. Bragg reflector and laser fired back contact in a-Si:H/c-Si heterostructure solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Tucci, M. [ENEA, Research Center Casaccia, via Anguillarese 301, S. Maria di Galeria 00123, Rome (Italy)], E-mail: mario.tucci@casaccia.enea.it; Serenelli, L.; Salza, E.; Pirozzi, L. [ENEA, Research Center Casaccia, via Anguillarese 301, S. Maria di Galeria 00123, Rome (Italy); De Cesare, G.; Caputo, D.; Ceccarelli, M. [Department of Electronic Engineering, University ' Sapienza' , via Eudossiana 18 00184, Rome (Italy)

    2009-03-15

    The amorphous/crystalline silicon (a-Si/c-Si) heterostructure has recently attracted new interest due to higher open circuit voltage V{sub oc} and low temperature fabrication processes. By reducing the wafer thickness all these characteristics become a necessity, together with the requirement of a back reflecting mirror, to obtain an effective optical confinement. To this aim dielectric mirrors can be adopted in the rear side of the solar cells, together with a local process of laser fired back Al contact. Taking advantage of a-Si/SiN{sub x} passivation properties of c-Si surface a Bragg reflector configuration can be formed on the rear side of the c-Si wafer by Plasma Enhanced Chemical Vapor Deposition (PECVD) alternating several couples of a-Si/SiN{sub x} and choosing their thicknesses to maximize the reflectance inward the c-Si wafer in the NIR spectrum. In this work we have adopted this mirror on the rear side of an n-a-Si/i-a-Si/p-c-Si heterostructure solar cell to obtain a full low temperature process. The cell back contact has been ensured by an Al diffusion into the c-Si wafer promoted by Nd-YAG pulsed laser. The front cell contact has been enhanced by chromium silicide CrSi formation on top of the n-a-Si layer and ITO deposition followed by an Ag grid. A V{sub oc} of 681 mV and 94% of IQE at 1000 nm have been reached.

  6. Single crystalline silicon solar cells with rib structure

    Science.gov (United States)

    Yoshiba, Shuhei; Hirai, Masakazu; Abe, Yusuke; Konagai, Makoto; Ichikawa, Yukimi

    2017-02-01

    To improve the conversion efficiency of Si solar cells, we have developed a thin Si wafer-based solar cell that uses a rib structure. The open-circuit voltage of a solar cell is known to increase with deceasing wafer thickness if the cell is adequately passivated. However, it is not easy to handle very thin wafers because they are brittle and are subject to warpage. We fabricated a lattice-shaped rib structure on the rear side of a thin Si wafer to improve the wafer's strength. A silicon nitride film was deposited on the Si wafer surface and patterned to form a mask to fabricate the lattice-shaped rib, and the wafer was then etched using KOH to reduce the thickness of the active area, except for the rib region. Using this structure in a Si heterojunction cell, we demonstrated that a high open-circuit voltage (VOC) could be obtained by thinning the wafer without sacrificing its strength. A wafer with thickness of 30 μm was prepared easily using this structure. We then fabricated Si heterojunction solar cells using these rib wafers, and measured their implied VOC as a function of wafer thickness. The measured values were compared with device simulation results, and we found that the measured VOC agrees well with the simulated results. To optimize the rib and cell design, we also performed device simulations using various wafer thicknesses and rib dimensions.

  7. Single crystalline silicon solar cells with rib structure

    Directory of Open Access Journals (Sweden)

    Shuhei Yoshiba

    2017-02-01

    Full Text Available To improve the conversion efficiency of Si solar cells, we have developed a thin Si wafer-based solar cell that uses a rib structure. The open-circuit voltage of a solar cell is known to increase with deceasing wafer thickness if the cell is adequately passivated. However, it is not easy to handle very thin wafers because they are brittle and are subject to warpage. We fabricated a lattice-shaped rib structure on the rear side of a thin Si wafer to improve the wafer’s strength. A silicon nitride film was deposited on the Si wafer surface and patterned to form a mask to fabricate the lattice-shaped rib, and the wafer was then etched using KOH to reduce the thickness of the active area, except for the rib region. Using this structure in a Si heterojunction cell, we demonstrated that a high open-circuit voltage (VOC could be obtained by thinning the wafer without sacrificing its strength. A wafer with thickness of 30 μm was prepared easily using this structure. We then fabricated Si heterojunction solar cells using these rib wafers, and measured their implied VOC as a function of wafer thickness. The measured values were compared with device simulation results, and we found that the measured VOC agrees well with the simulated results. To optimize the rib and cell design, we also performed device simulations using various wafer thicknesses and rib dimensions.

  8. The energy payback time of advanced crystalline silicon PV modules in 2020. A prospective study

    Energy Technology Data Exchange (ETDEWEB)

    Mann, S.A. [FOM Institute AMOLF, Science Park 104, 1098 XG Amsterdam (Netherlands); Van Sark, W.G.J.H.M. [Copernicus Institute, Utrecht University, CD, Utrecht (Netherlands); De Wild-Scholten, M.J. [SmartGreenScans, GH, Groet (Netherlands); Fthenakis, V.M. [Center for Life Cycle Analysis, Columbia University, New York, NY (United States); Sinke, W.C. [ECN Solar Energy, Petten (Netherlands)

    2013-02-11

    The photovoltaic (PV) market is experiencing vigorous growth, whereas prices are dropping rapidly. This growth has in large part been possible through public support, deserved for its promise to produce electricity at a low cost to the environment. It is therefore important to monitor and minimize environmental impacts associated with PV technologies. In this work, we forecast the environmental performance of crystalline silicon technologies in 2020, the year in which electricity from PV is anticipated to be competitive with wholesale electricity costs all across Europe. Our forecasts are based on technological scenario development and a prospective life cycle assessment with a thorough uncertainty and sensitivity analysis. We estimate that the energy payback time at an in-plane irradiation of 1700 kWh/(m2 year) of crystalline silicon modules can be reduced to below 0.5 years by 2020, which is less than half of the current energy payback time.

  9. 17th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes; Workshop Proceedings

    Energy Technology Data Exchange (ETDEWEB)

    Sopori, B. L.

    2007-08-01

    The National Center for Photovoltaics sponsored the 17th Workshop on Crystalline Silicon Solar Cells & Modules: Materials and Processes, held in Vail, CO, August 5-8, 2007. This meeting provided a forum for an informal exchange of technical and scientific information between international researchers in the photovoltaic and relevant non-photovoltaic fields. The theme of this year's meeting was 'Expanding Technology for a Future Powered by Si Photovoltaics.'

  10. Microdefects and self-interstitial diffusion in crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Knowlton, W.B.

    1998-05-01

    In this thesis, a study is presented of D-defects and self-interstitial diffusion in silicon using Li ion (Li{sup +}) drifting in an electric field and transmission electron microscopy (TEM). Obstruction of Li{sup +} drifting has been found in wafers from certain but not all FZ p-type Si. Incomplete Li{sup +} drifting always occurs in the central region of the wafers. This work established that interstitial oxygen is not responsible for hindering Li{sup +} drifting. TEM was performed on a samples from the partially Li{sup +} drifted area and compared to regions without D-defects. Precipitates were found only in the region containing D-defects that had partially Li{sup +} drifted. This result indicates D-defects are responsible for the precipitation that halts the Li{sup +} drift process. Nitrogen (N) doping has been shown to eliminate D-defects as measured by conventional techniques. Li{sup +} drifting and D-defects provide a useful means to study Si self-interstitial diffusion. The process modeling program SUPREM-IV was used to simulate the results of Si self-interstitial diffusion obtained from Li{sup +} drifting experiments. Anomalous results from the Si self-interstitial diffusion experiments forced a re-examination of the possibility of thermal dissociation of D-defects. Thermal annealing experiments that were performed support this possibility. A review of the current literature illustrates the need for more research on the effects of thermal processing on FZ Si to understand the dissolution kinetics of D-defects.

  11. Potential of ITO nanoparticles formed by hydrogen treatment in PECVD for improved performance of back grid contact crystalline silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Mandal, Sourav; Mitra, Suchismita; Dhar, Sukanta; Ghosh, Hemanta; Banerjee, Chandan, E-mail: chandanbanerjee74@gmail.com; Datta, Swapan K.; Saha, Hiranmoy

    2015-09-15

    Highlights: • Indium tin oxide (ITO) nanoparticles as back scatterers in c-Si solar cells. • ITO NP have comparatively low dissipative losses and tunable optical properties. • ITO NP formed by hydrogen plasma treatment on sputtered ITO film. • Enhanced absorption and carrier collection at longer wavelengths due to enhanced light trapping. - Abstract: This paper discusses the prospect of using indium tin oxide (ITO) nanoparticles as back scatterers in crystalline silicon solar cells instead of commonly used metal nanoparticles as ITO nanoparticles have comparatively low dissipative losses and tunable optical properties. ITO nanoparticles of ∼5–10 nm size is developed on the rear side of the solar cell by deposition of ∼5–10 nm thick ITO layer by DC magnetron sputtering followed by hydrogen treatment in PECVD. The silicon solar cell is fabricated in the laboratory using conventional method with grid metal contact at the back surface. Various characterizations like FESEM, TEM, AFM, XRD, EQE and IV characteristics are performed to analyze the morphology, chemical composition, optical characteristics and electrical performance of the device. ITO nanoparticles at the back surface of the solar cell significantly enhances the short circuit current, open circuit voltage and efficiency of the solar cell. These enhancements may be attributed to the increased absorption and carrier collection at longer wavelengths of solar spectrum due to enhanced light trapping by the ITO nanoparticles and surface passivation by the hydrogen treatment of the back surface.

  12. The fabrication of quantum wires in silicon utilising the characteristics of solid phase epitaxial regrowth of crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Liu, A.C.Y.; McCallum, J.C. [Melbourne Univ. Parkville, VIC (Australia). School of Physics, Microanalytical Research Centre

    1998-06-01

    The process of solid phase epitaxy (SPE) in semiconductor materials is one which has been intensively researched due to possible applications in the semiconductor industry. SPE is a solid phase transformation, in which an amorphous layer can be recrystallized either through heating or a combination of heating and ion bombardment. The transformation is believed to occur exclusively at the interface between the amorphous and crystalline layers, with individual atoms from the amorphous phase being incorporated into the crystalline phase by some point defect mechanism. The process has been observed to follow an Arrhenius temperature dependence. A wafer silicon was subjected to a multi-energy silicon implant through a fine nickel grid to amorphise region to a depth of 5{mu}m creating an array of amorphous wells. Metal impurity atoms were then implanted in this region at energy of 500 keV. Samples were examined using an optical microscope and the Alphastep profiler at RMIT. It was confirmed that burgeoning wells were about 2 {mu}m wide and rose about 0.01 {mu}m above the silicon substrate. Extended abstract. 4 refs., 3 figs.

  13. In-Situ Characterization of Potential-Induced Degradation in Crystalline Silicon Photovoltaic Modules Through Dark I–V Measurements

    Energy Technology Data Exchange (ETDEWEB)

    Luo, Wei; Hacke, Peter; Singh, Jai Prakash; Chai, Jing; Wang, Yan; Ramakrishna, Seeram; Aberle, Armin G.; Khoo, Yong Sheng

    2017-01-01

    A temperature correction methodology for in-situ dark I-V(DIV) characterization of conventional p-type crystalline silicon photovoltaic (PV) modules undergoing potential-induced degradation (PID) is proposed.

  14. Selective functionalization and loading of biomolecules in crystalline silicon nanotube field-effect-transistors.

    Science.gov (United States)

    Kwon, Soonshin; Chen, Zack C Y; Noh, Hyunwoo; Lee, Ju Hun; Liu, Hang; Cha, Jennifer N; Xiang, Jie

    2014-07-21

    Crystalline silicon nanotubes (Si NTs) provide distinctive advantages as electrical and biochemical analysis scaffolds through their unique morphology and electrical tunability compared to solid nanowires or amorphous/non-conductive nanotubes. Such potential is investigated in this report. Gate-dependent four-probe current-voltage analysis reveals electrical properties such as resistivity to differ by nearly 3 orders of magnitude between crystalline and amorphous Si NTs. Analysis of transistor transfer characteristics yields a field effect mobility of 40.0 cm(2) V(-1) s(-1) in crystalline Si NTs. The hollow morphology also allows selective inner/outer surface functionalization and loading capability either as a carrier for molecular targets or as a nanofluidic channel for biomolecular assays. We present for the first time a demonstration of internalization of fluorescent dyes (rhodamine) and biomolecules (BSA) in Si NTs as long as 22 μm in length.

  15. Microdefects and self-interstitial diffusion in crystalline silicon

    Science.gov (United States)

    Knowlton, William Barthelemy

    In this thesis, a study is presented of D-defects and self-interstitial diffusion in silicon using Li ion (Lisp+) drifting in an electric field and transmission electron microscopy (TEM). Obstruction of Lisp+ drifting has been found in wafers from certain but not all FZ p-type Si. Incomplete Lisp+ drifting always occurs in the central region of the wafers. This work established that interstitial oxygen is not responsible for hindering Lisp+ drifting. The Osb i concentration was measured ({˜}2× 10sp{15}\\ cmsp{-3}) by local vibrational mode Fourier transform infrared spectroscopy and did not vary radially across the wafer. TEM was performed on a samples from the partially Lisp+ drifted area and compared to regions without D-defects. Precipitates were found only in the region containing D-defects that had partially Lisp+ drifted. This result indicates D-defects are responsible for the precipitation that halts the Lisp+ drift process. The precipitates were characterized using selected area diffraction (SAD) and image contrast analysis. The results suggested that the precipitates may cause stacking faults and their identity may be lithium silicides such as Lisb{21}Sisb5\\ and\\ Lisb{13}Sisb4. TEM revealed a decreasing distribution of Li precipitates as a function of Lisp+ drift depth along the growth direction. A preliminary model is presented that simulates Lisp+ drifting. The objective of the model is to incorporate the Li precipitate density distribution and Lisp+ drift depth to extract the size and capture cross-section of the D-defects. Nitrogen (N) doping has been shown to eliminate D-defects as measured by conventional techniques. However, Lisp+ drifting has shown that D-defects are indeed still present. Lisp+ drifting is able to detect D-defects at concentrations lower than conventional techniques. Lisp+ drifting and D-defects provide a useful means to study Si self-interstitial diffusion. The process modeling program SUPREM-IV was used to simulate the

  16. P-μc-Si1-xGex:H thin film by VHF-PECVD

    Institute of Scientific and Technical Information of China (English)

    SHANG Ze-ren; ZHANG jian-jun; ZHANG Li-ping; HU Zeng-xin; XUE Jun-ming; ZHAO Ying; GENG Xin-hua

    2008-01-01

    In this paper,a series of boron doped microcrystalline hydrogenated silicon-germanium(p-μc-Si1-xGex:H)was deposited by very high frequency plasma-enhanced chemical vapor deposition(VHF-PECVD)from SiH4 and GeF4 mixtures.The effect of GeF4concentration on films'composition.structure and electrical properties was studied.The resuIts show tllat with the increase of GeF4 concentration,the Ge fraction x increases.The dark conductivity and crystalline volume fraction increase first,and then decrease.When the GC is 4%,p-μc-Si1-xGex:H matefiai with high conductivity,low activation energy(σ=1.68 S/cm,Eg=0.047 eV),high crystalline volume fraction (60%)and with an average transmission coefficient over the long wave region reaching 0.9 at the thickness of 72 am was achieved.The experimental results were discussed in detail.

  17. Simple processing of back-contacted silicon heterojunction solar cells using selective-area crystalline growth

    Science.gov (United States)

    Tomasi, Andrea; Paviet-Salomon, Bertrand; Jeangros, Quentin; Haschke, Jan; Christmann, Gabriel; Barraud, Loris; Descoeudres, Antoine; Seif, Johannes Peter; Nicolay, Sylvain; Despeisse, Matthieu; de Wolf, Stefaan; Ballif, Christophe

    2017-04-01

    For crystalline-silicon solar cells, voltages close to the theoretical limit are nowadays readily achievable when using passivating contacts. Conversely, maximal current generation requires the integration of the electron and hole contacts at the back of the solar cell to liberate its front from any shadowing loss. Recently, the world-record efficiency for crystalline-silicon single-junction solar cells was achieved by merging these two approaches in a single device; however, the complexity of fabricating this class of devices raises concerns about their commercial potential. Here we show a contacting method that substantially simplifies the architecture and fabrication of back-contacted silicon solar cells. We exploit the surface-dependent growth of silicon thin films, deposited by plasma processes, to eliminate the patterning of one of the doped carrier-collecting layers. Then, using only one alignment step for electrode definition, we fabricate a proof-of-concept 9-cm2 tunnel-interdigitated back-contact solar cell with a certified conversion efficiency >22.5%.

  18. Simple processing of back-contacted silicon heterojunction solar cells using selective-area crystalline growth

    KAUST Repository

    Tomasi, Andrea

    2017-04-24

    For crystalline-silicon solar cells, voltages close to the theoretical limit are nowadays readily achievable when using passivating contacts. Conversely, maximal current generation requires the integration of the electron and hole contacts at the back of the solar cell to liberate its front from any shadowing loss. Recently, the world-record efficiency for crystalline-silicon single-junction solar cells was achieved by merging these two approaches in a single device; however, the complexity of fabricating this class of devices raises concerns about their commercial potential. Here we show a contacting method that substantially simplifies the architecture and fabrication of back-contacted silicon solar cells. We exploit the surface-dependent growth of silicon thin films, deposited by plasma processes, to eliminate the patterning of one of the doped carrier-collecting layers. Then, using only one alignment step for electrode definition, we fabricate a proof-of-concept 9-cm2 tunnel-interdigitated back-contact solar cell with a certified conversion efficiency >22.5%.

  19. Nanopatterning of Crystalline Silicon Using Anodized Aluminum Oxide Templates for Photovoltaics

    Science.gov (United States)

    Chao, Tsu-An

    A novel thin film anodized aluminum oxide templating process was developed and applied to make nanopatterns on crystalline silicon to enhance the optical properties of silicon. The thin film anodized aluminum oxide was created to improve the conventional thick aluminum templating method with the aim for potential large scale fabrication. A unique two-step anodizing method was introduced to create high quality nanopatterns and it was demonstrated that this process is superior over the original one-step approach. Optical characterization of the nanopatterned silicon showed up to 10% reduction in reflection in the short wavelength range. Scanning electron microscopy was also used to analyze the nanopatterned surface structure and it was found that interpore spacing and pore density can be tuned by changing the anodizing potential.

  20. Application of nano-crystalline silicon film in the fabrication of field-emission pressure sensor

    Institute of Scientific and Technical Information of China (English)

    廖波; 陈旻; 孔德文; 张大成; 李婷

    2003-01-01

    A kind of filed-emission array pressure sensor is designed based on the quantum tunnel effect. The nano-crystalline silicon film is prepared by chemical vapor deposition (CVD) method, with the grain dimension and thickness of the film 3-9 nm and 30-40 nm, respectively. The nano-crystal- line silicon film is introduced into the cathode cones of the sensor, functioning as the essential emission part. The silicon nano phase is analyzed by HREM and TED, the microstructure of the single emitter and emitters array is inspected by SEM, and the field emission characteristics of the device are studied by an HP4145B transistor tester. The experimental results show that the measured current density emitted from the effective area of the sensor can reach 53.5 A/m2 when the exterior electric field is 5.6×105 V/m.

  1. Drift mechanism of mass transfer on heterogeneous reaction in crystalline silicon substrate

    Energy Technology Data Exchange (ETDEWEB)

    Kukushkin, S.A. [Institute of Problems of Mechanical Engineering, Russian Academy of Science, St Petersburg, 199178 (Russian Federation); St. Petersburg National Research University of Information Technologies, Mechanics and Optics, 197101 (Russian Federation); Osipov, A.V., E-mail: Andrey.V.Osipov@gmail.com [Institute of Problems of Mechanical Engineering, Russian Academy of Science, St Petersburg, 199178 (Russian Federation); St. Petersburg National Research University of Information Technologies, Mechanics and Optics, 197101 (Russian Federation)

    2017-05-01

    This work aims to study the pressure dependence of the thickness of the epitaxial silicon carbide film growing from crystalline silicon due to the heterogeneous reaction with gaseous carbon monoxide. It turned out that this dependence exhibits the clear maximum. On further pressure increasing the film thickness decreases. The theoretical model has been developed which explains such a character of the dependence by the fact that the gaseous silicon monoxide reaction product inhibits the drift of the gaseous reagent through the channels of a crystal lattice, thus decreasing their hydraulic diameter. In the proposed hydraulic model, the dependences of the film thickness both on the gas pressure and time have been calculated. It was shown that not only the qualitative but also quantitative correspondence between theoretical and experimental results takes place. As one would expect, due to the Einstein relation, at short growth times the drift model coincides with the diffusion one. Consequences of this drift mechanism of epitaxial film growing are discussed. - Graphical abstract: This work aims to study the pressure dependence of the thickness of the epitaxial silicon carbide film growing from crystalline silicon due to the heterogeneous reaction with gaseous carbon monoxide. It turned out that this dependence exhibits the clear maximum. On further pressure increasing the film thickness decreases. The theoretical model has been developed which explains such a character of the dependence by the fact that the gaseous silicon monoxide reaction product inhibits the drift of the gaseous reagent through the channels of a crystal lattice, thus decreasing their hydraulic diameter. - Highlights: • It is established that the greater pressure, the smaller is the reaction rate. • The reaction product prevents penetration of the reagent into a reaction zone. • For description the hydraulic model of crystal lattice channels is developed. • Theoretical results for polytropic

  2. Optical and optomechanical ultralightweight C/SiC components

    Science.gov (United States)

    Papenburg, Ulrich; Pfrang, Wilhelm; Kutter, G. S.; Mueller, Claus E.; Kunkel, Bernd P.; Deyerler, Michael; Bauereisen, Stefan

    1999-11-01

    Optical and optomechanical structures based on silicon carbide (SiC) ceramics are becoming increasingly important for ultra- lightweight optical systems that must work in adverse environments. At IABG and Dornier Satellite Systems (DSS) in Munich, a special form of SiC ceramics carbon fiber reinforced silicon carbide (C/SiCR) has been developed partly under ESA and NASA contracts. C/SiCR is a light-weight, high- strength engineering material that features tunable mechanical and thermal properties. It offers exceptional design freedom due to its reduced brittleness and negligible volume shrinkage during processing in comparison to traditional, powder-based ceramics. Furthermore, its rapid fabrication process produces near-net-shape components using conventional NC machining/milling equipment and, thus, provides substantial schedule, cost, and risk savings. These characteristics allow C/SiCR to overcome many of the problems associated with more traditional optical materials. To date, C/SiCR has been used to produce ultra-lightweight mirrors and reflectors, antennas, optical benches, and monolithic and integrated reference structures for a variety of space and terrestrial applications. This paper describes the material properties, optical system and structural design aspects, the forming and manufacturing process including high-temperature joining technology, precision grinding and cladding techniques, and the performance results of a number of C/SiCR optical components we have built.

  3. Substrate bias effect on crystallinity of polycrystalline silicon thin films prepared by pulsed ion-beam evaporation method

    Energy Technology Data Exchange (ETDEWEB)

    Ali, Fazlat; Gunji, Michiharu; Yang, Sung-Chae; Suzuki, Tsuneo; Suematsu, Hisayuki; Jiang, Weihua; Yatsui, Kiyoshi [Nagaoka Univ. of Technology, Extreme Energy-Density Research Inst., Nagaoka, Niigata (Japan)

    2002-06-01

    The deposition of polycrystalline silicon thin films has been tried by a pulsed ion-beam evaporation method, where high crystallinity and deposition rate have been achieved without heating the substrate. The crystallinity and the deposition rate were improved by applying bias voltage to the substrate, where instantaneous substrate heating might have occurred by ion-bombardment. (author)

  4. RESEARCH ON THE RELATIONSHIP MODEL BETWEEN THE POROSITY OF C/C PREFORM AND PERFORMANCE OF C/SIC COMPOSITES FABRICATED BY GASEOUS SILICON INFILTRATION%C/C预制体孔隙率与气相硅浸渗制备C/SiC复合材料性能关系的模型研究

    Institute of Scientific and Technical Information of China (English)

    刘伟; 刘荣军; 曹英斌; 杨会永

    2013-01-01

    建立了C/C预制体孔隙率与C/SiC复合材料组成的关系模型,并通过表征不同孔隙率的C/C预制体气相硅浸渗制备的C/SiC复合材料的组成和力学性能对模型进行了验证.研究发现,实验结果与模型预测结果基本一致.随着C/C预制体孔隙率的增大,C/SiC复合材料的密度出现先上升后下降的规律,力学性能也遵从同样的规律.XRD分析和相含量测试结果均表明复合材料的相含量与模型预测结果基本一致.实验结果与模型预测结果产生偏差的主要原因是裂解碳反应不完全.%A model used to in search of the relationship between the porosity of C/C preforms and the constitute of C/SiC composites was established and validated, where the C/SiC composites was fabricated by the gaseous silicon infiltration process with the C/C preforms possessed different porosities. The results showed that the value derived from the experiment in accord with predicted ones mostly. With the increase of porosity of C/C perform, the density of C/SiC composites also increased at first and then decreased after a critical value, so are the mechanical properties and phase content which derived from XRD analysis. The main reason for the deviation between the model and experiment is the un-totally reaction of pyrolysis carbon.

  5. Nano-Photonic Structures for Light Trapping in Ultra-Thin Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Prathap Pathi

    2017-01-01

    Full Text Available Thick wafer-silicon is the dominant solar cell technology. It is of great interest to develop ultra-thin solar cells that can reduce materials usage, but still achieve acceptable performance and high solar absorption. Accordingly, we developed a highly absorbing ultra-thin crystalline Si based solar cell architecture using periodically patterned front and rear dielectric nanocone arrays which provide enhanced light trapping. The rear nanocones are embedded in a silver back reflector. In contrast to previous approaches, we utilize dielectric photonic crystals with a completely flat silicon absorber layer, providing expected high electronic quality and low carrier recombination. This architecture creates a dense mesh of wave-guided modes at near-infrared wavelengths in the absorber layer, generating enhanced absorption. For thin silicon (<2 μm and 750 nm pitch arrays, scattering matrix simulations predict enhancements exceeding 90%. Absorption approaches the Lambertian limit at small thicknesses (<10 μm and is slightly lower (by ~5% at wafer-scale thicknesses. Parasitic losses are ~25% for ultra-thin (2 μm silicon and just 1%–2% for thicker (>100 μm cells. There is potential for 20 μm thick cells to provide 30 mA/cm2 photo-current and >20% efficiency. This architecture has great promise for ultra-thin silicon solar panels with reduced material utilization and enhanced light-trapping.

  6. Programmable SERS active substrates for chemical and biosensing applications using amorphous/crystalline hybrid silicon nanomaterial

    Science.gov (United States)

    Powell, Jeffery Alexander; Venkatakrishnan, Krishnan; Tan, Bo

    2016-01-01

    We present the creation of a unique nanostructured amorphous/crystalline hybrid silicon material that exhibits surface enhanced Raman scattering (SERS) activity. This nanomaterial is an interconnected network of amorphous/crystalline nanospheroids which form a nanoweb structure; to our knowledge this material has not been previously observed nor has it been applied for use as a SERS sensing material. This material is formed using a femtosecond synthesis technique which facilitates a laser plume ion condensation formation mechanism. By fine-tuning the laser plume temperature and ion interaction mechanisms within the plume, we are able to precisely program the relative proportion of crystalline Si to amorphous Si content in the nanospheroids as well as the size distribution of individual nanospheroids and the size of Raman hotspot nanogaps. With the use of Rhodamine 6G (R6G) and Crystal Violet (CV) chemical dyes, we have been able to observe a maximum enhancement factor of 5.38 × 106 and 3.72 × 106 respectively, for the hybrid nanomaterial compared to a bulk Si wafer substrate. With the creation of a silicon-based nanomaterial capable of SERS detection of analytes, this work demonstrates a redefinition of the role of nanostructured Si from an inactive to SERS active role in nano-Raman sensing applications.

  7. Evolutionary process development towards next generation crystalline silicon solar cells : a semiconductor process toolbox application

    Science.gov (United States)

    John, J.; Prajapati, V.; Vermang, B.; Lorenz, A.; Allebe, C.; Rothschild, A.; Tous, L.; Uruena, A.; Baert, K.; Poortmans, J.

    2012-08-01

    Bulk crystalline Silicon solar cells are covering more than 85% of the world's roof top module installation in 2010. With a growth rate of over 30% in the last 10 years this technology remains the working horse of solar cell industry. The full Aluminum back-side field (Al BSF) technology has been developed in the 90's and provides a production learning curve on module price of constant 20% in average. The main reason for the decrease of module prices with increasing production capacity is due to the effect of up scaling industrial production. For further decreasing of the price per wattpeak silicon consumption has to be reduced and efficiency has to be improved. In this paper we describe a successive efficiency improving process development starting from the existing full Al BSF cell concept. We propose an evolutionary development includes all parts of the solar cell process: optical enhancement (texturing, polishing, anti-reflection coating), junction formation and contacting. Novel processes are benchmarked on industrial like baseline flows using high-efficiency cell concepts like i-PERC (Passivated Emitter and Rear Cell). While the full Al BSF crystalline silicon solar cell technology provides efficiencies of up to 18% (on cz-Si) in production, we are achieving up to 19.4% conversion efficiency for industrial fabricated, large area solar cells with copper based front side metallization and local Al BSF applying the semiconductor toolbox.

  8. Enhanced cooling in mono-crystalline ultra-thin silicon by embedded micro-air channels

    Science.gov (United States)

    Ghoneim, Mohamed T.; Fahad, Hossain M.; Hussain, Aftab M.; Rojas, Jhonathan P.; Torres Sevilla, Galo A.; Alfaraj, Nasir; Lizardo, Ernesto B.; Hussain, Muhammad M.

    2015-12-01

    In today's digital world, complementary metal oxide semiconductor (CMOS) technology enabled scaling of bulk mono-crystalline silicon (100) based electronics has resulted in their higher performance but with increased dynamic and off-state power consumption. Such trade-off has caused excessive heat generation which eventually drains the charge of battery in portable devices. The traditional solution utilizing off-chip fans and heat sinks used for heat management make the whole system bulky and less mobile. Here we show, an enhanced cooling phenomenon in ultra-thin (>10 μm) mono-crystalline (100) silicon (detached from bulk substrate) by utilizing deterministic pattern of porous network of vertical "through silicon" micro-air channels that offer remarkable heat and weight management for ultra-mobile electronics, in a cost effective way with 20× reduction in substrate weight and a 12% lower maximum temperature at sustained loads. We also show the effectiveness of this event in functional MOS field effect transistors (MOSFETs) with high-κ/metal gate stacks.

  9. Silicon-Rich Silicon Carbide Hole-Selective Rear Contacts for Crystalline-Silicon-Based Solar Cells.

    Science.gov (United States)

    Nogay, Gizem; Stuckelberger, Josua; Wyss, Philippe; Jeangros, Quentin; Allebé, Christophe; Niquille, Xavier; Debrot, Fabien; Despeisse, Matthieu; Haug, Franz-Josef; Löper, Philipp; Ballif, Christophe

    2016-12-28

    The use of passivating contacts compatible with typical homojunction thermal processes is one of the most promising approaches to realizing high-efficiency silicon solar cells. In this work, we investigate an alternative rear-passivating contact targeting facile implementation to industrial p-type solar cells. The contact structure consists of a chemically grown thin silicon oxide layer, which is capped with a boron-doped silicon-rich silicon carbide [SiCx(p)] layer and then annealed at 800-900 °C. Transmission electron microscopy reveals that the thin chemical oxide layer disappears upon thermal annealing up to 900 °C, leading to degraded surface passivation. We interpret this in terms of a chemical reaction between carbon atoms in the SiCx(p) layer and the adjacent chemical oxide layer. To prevent this reaction, an intrinsic silicon interlayer was introduced between the chemical oxide and the SiCx(p) layer. We show that this intrinsic silicon interlayer is beneficial for surface passivation. Optimized passivation is obtained with a 10-nm-thick intrinsic silicon interlayer, yielding an emitter saturation current density of 17 fA cm(-2) on p-type wafers, which translates into an implied open-circuit voltage of 708 mV. The potential of the developed contact at the rear side is further investigated by realizing a proof-of-concept hybrid solar cell, featuring a heterojunction front-side contact made of intrinsic amorphous silicon and phosphorus-doped amorphous silicon. Even though the presented cells are limited by front-side reflection and front-side parasitic absorption, the obtained cell with a Voc of 694.7 mV, a FF of 79.1%, and an efficiency of 20.44% demonstrates the potential of the p(+)/p-wafer full-side-passivated rear-side scheme shown here.

  10. Crystalline silicon photovoltaics via low-temperature TiO 2/Si and PEDOT/Si heterojunctions

    Science.gov (United States)

    Nagamatsu, Ken Alfred

    The most important goals in developing solar cell technology are to achieve high power conversion efficiencies and lower costs of manufacturing. Solar cells based on crystalline silicon currently dominate the market because they can achieve high efficiency. However, conventional p-n junction solar cells require high-temperature diffusions of dopants, and conventional heterojunction cells based on amorphous silicon require plasma-enhanced deposition, both of which can add manufacturing costs. This dissertation investigates an alternative approach, which is to form crystalline-silicon-based solar cells using heterojunctions with materials that are easily deposited at low temperatures and without plasma enhancement, such as organic semiconductors and metal oxides. We demonstrate a heterojunction between the organic polymer, poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT), and crystalline silicon, which acts as a hole-selective contact and an alternative to a diffused p-n junction. We also present the use of a heterojunction between titanium dioxide and crystalline silicon as a passivating electron-selective contact. The Si/TiO2 heterojunction is demonstrated for the first time as a back-surface field in a crystalline silicon solar cell, and is incorporated into a PEDOT/Si device. The resulting PEDOT/Si/TiO2 solar cell represents an alternative to conventional silicon solar cells that rely on thermally-diffused junctions or plasma-deposited heterojunctions. Finally, we investigate the merits of using conductive networks of silver nanowires to enhance the photovoltaic performance of PEDOT/Si solar cells. The investigation of these materials and devices contributes to the growing body of work regarding crystalline silicon solar cells made with selective contacts.

  11. The Temperature Dependence Coefficients of Amorphous Silicon and Crystalline Photovoltaic Modules Using Malaysian Field Test Investigation

    Directory of Open Access Journals (Sweden)

    Sulaiman Shaari

    2009-01-01

    Full Text Available The temperature dependence coefficients of amorphous silicon and crystalline photovoltaic (PV modules using Malaysian field data have been obtained using linear regression technique. This is achieved by studying three test stand-alone PV-battery systems using 62 Wp a-Si, 225 Wp multi-crystalline and 225 Wp mono-crystalline PV modules. These systems were designed to provide electricity for rural domestic loads at 200 W, 500 W and 530 W respectively. The systems were installed in the field with data monitored using data loggers. Upon analysis, the study found that the normalized power output per operating array temperature for the amorphous silicon modules, multi-crystalline modules and mono-crystalline modules were: +0.037 per°C, +0.0225 per °C and +0.0263 per °C respectively. In addition, at a solar irradiance value of 500 Wm-2, the current, voltage, power and efficiency dependence coefficients on operating array temperatures obtained from linear regression were: +37.0 mA per °C, -31.8 mV per °C, -0.1036 W per °C and -0.0214% per °C, for the a-Si modules, +22.5 mA per °C, -39.4 mV per °C, -0.2525 W per °C, -0.072 % per °C for the multi-crystalline modules and +26.3 mA per °C, -32.6 mV per °C, -0.1742 W per °C, -0.0523 % per °C for the mono-crystalline modules. These findings have a direct impact on all systems design and sizing in similar climate regions. It is thus recommended that the design and sizing of PV systems in the hot and humid climate regions of the globe give due address to these findings.

  12. CVD growth and characterization of 3C-SiC thin films

    Indian Academy of Sciences (India)

    A Gupta; D Paramanik; S Varma; C Jacob

    2004-10-01

    Cubic silicon carbide (3C-SiC) thin films were grown on (100) and (111) Si substrates by CVD technique using hexamethyldisilane (HMDS) as the source material in a resistance heated furnace. HMDS was used as the single source for both Si and C though propane was available for the preliminary carbonization. For selective epitaxial growth, patterned Si (100) substrates were used. The effect of different growth parameters such as substrate orientation, growth temperature, precursor concentration, etc on growth was examined to improve the film quality. The surface morphology, microstructure and crystallinity of grown films were studied using optical microscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD) analysis and X-ray photoelectron spectroscopy (XPS).

  13. Effects of initial layers on surface roughness and crystallinity of microcrystalline silicon thin films formed by remote electron cyclotron resonance silane plasma

    CERN Document Server

    Murata, K; Hori, Masaki; Goto, T; Ito, M

    2002-01-01

    We have observed mu c-Si:H films grown in the glass substrate in electron cyclotron resonance plasma-enhanced chemical vapor deposition employing two-step growth (TSG) method, where the seed layer was formed without charged species firstly, and subsequently, the film with charged species. The mu c-Si:H films with smooth surface and high crystallinity were synthesized with a relatively high deposition rate at a low substrate temperature by TSG. By Fourier transform infrared attenuated-total reflection, it was found that the surface roughness and crystallinity of seed layer were related to the ratio of SiH bonds over SiH sub 2 ones in the film. Consequently, the control of chemical bonds at the initial layer is of importance and TSG method is effective for the formation of mu c-Si:H film with high quality.

  14. Organic nanowire/crystalline silicon p-n heterojunctions for high-sensitivity, broadband photodetectors.

    Science.gov (United States)

    Deng, Wei; Jie, Jiansheng; Shang, Qixun; Wang, Jincheng; Zhang, Xiujuan; Yao, Shenwen; Zhang, Qing; Zhang, Xiaohong

    2015-01-28

    Organic/inorganic hybrid devices are promising candidates for high-performance, low-cost optoelectronic devices, by virtue of their unique properties. Polycrystalline/amorphous organic films are widely used in hybrid devices, because defects in the films hamper the improvement of device performance. Here, we report the construction of 2,4-bis[4-(N,N-dimethylamino)phenyl]squaraine (SQ) nanowire (NW)/crystalline Si (c-Si) p-n heterojunctions. Thanks to the high crystal quality of the SQ NWs, the heterojunctions exhibit excellent diode characteristics in darkness. It is significant that the heterojunctions have been found to be capable of detecting broadband light with wavelengths spanning from ultraviolet (UV) light, to visible (Vis) light, to near-infrared (NIR) light, because of the complementary spectrum absorption of SQ NWs with Si. The junction is demonstrated to play a core role in enhancing the device performance, in terms of ultrahigh sensitivity, excellent stability, and fast response. The photovoltaic characteristics of the heterojunctions are further investigated, revealing a power conversion efficiency (PCE) of up to 1.17%. This result also proves the potential of the device as self-powered photodetectors operating at zero external bias voltage. This work presents an important advance in constructing single-crystal organic nanostructure/inorganic heterojunctions and will enable future exploration of their applications in broadband photodetectors and solar cells.

  15. Two-dimensional modeling of the back amorphous-crystalline silicon heterojunction (BACH) photovoltaic device

    Science.gov (United States)

    Chowdhury, Zahidur R.; Chutinan, Alongkarn; Gougam, Adel B.; Kherani, Nazir P.; Zukotynski, Stefan

    2010-06-01

    Back Amorphous-Crystalline Silicon Heterojunction (BACH)1 solar cell can be fabricated using low temperature processes while integrating high efficiency features of heterojunction silicon solar cells and back-contact homojunction solar cells. This article presents a two-dimensional modeling study of the BACH cell concept. A parametric study of the BACH cell has been carried out using Sentaurus after benchmarking the software. A detailed model describing the optical generation is defined. Solar cell efficiency of 24.4% is obtained for AM 1.5 global spectrum with VOC of greater than 720 mV and JSC exceeding 40 mA/cm2, considering realistic surface passivation quality and other dominant recombination processes.

  16. Design and optimization of ultrathin crystalline silicon solar cells using an efficient back reflector

    Directory of Open Access Journals (Sweden)

    S. Saravanan

    2015-05-01

    Full Text Available Thin film solar cells are cheaper but having low absorption in longer wavelength and hence, an effective light trapping mechanism is essential. In this work, we proposed an ultrathin crystalline silicon solar cell which showed extraordinary performance due to enhanced light absorption in visible and infrared part of solar spectrum. Various designing parameters such as number of distributed Bragg reflector (DBR pairs, anti-reflection layer thickness, grating thickness, active layer thickness, grating duty cycle and period were optimized for the optimal performance of solar cell. An ultrathin silicon solar cell with 40 nm active layer could produce an enhancement in cell efficiency ∼15 % and current density ∼23 mA/cm2. This design approach would be useful for the realization of new generation of solar cells with reduced active layer thickness.

  17. Temperature dependence of the radiative recombination coefficient in crystalline silicon from spectral photoluminescence

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Hieu T., E-mail: hieu.nguyen@anu.edu.au; Macdonald, Daniel [Research School of Engineering, College of Engineering and Computer Science, The Australian National University, Canberra, ACT 0200 (Australia); Baker-Finch, Simeon C. [Research School of Engineering, College of Engineering and Computer Science, The Australian National University, Canberra, ACT 0200 (Australia); PV Lighthouse, Coledale, NSW 2515 (Australia)

    2014-03-17

    The radiative recombination coefficient B(T) in crystalline silicon is determined for the temperature range 90–363 K, and in particular from 270 to 350 K with an interval of 10 K, where only sparse data are available at present. The band-band absorption coefficient established recently by Nguyen et al. [J. Appl. Phys. 115, 043710 (2014)] via photoluminescence spectrum measurements is employed to compute the values of B(T) at various temperatures. The results agree very well with literature data from Trupke et al. [J. Appl. Phys. 94, 4930 (2003).] We present a polynomial parameterization describing the temperature dependence of the product of B(T) and the square of the intrinsic carrier density. We also find that B(T) saturates at a near constant value at room temperature and above for silicon samples with relatively low free carrier densities.

  18. Incoherent-light processing of single- and poly-crystalline silicon solar cells

    Science.gov (United States)

    Nielsen, L. D.; Larsen, A. N.

    Transient heating with incoherent continuous light from a xenon arc-lamp has been studied as a possible process step in the production of single- and poly-crystalline silicon solar cells. Annealing of phosphorus and arsenic ion implantations have been made, with phosphorus implantations leading to solar cell efficiences of 8.3 and 5.8 percent for 100 single crystal and Wacker-SILSO materials, respectively, both without AR-coating. Furthermore, incoherent-light induced diffusion of phosphorus from spin-on deposited doped oxide layer has been studied and has resulted in efficiencies of 7.9 and 6.6 percent, respectively, for the same two types of material. This latter process is concluded to be a promising technique for production of low-cost silicon solar cells with efficiencies of at least 10 percent without any vacuum or high-temperature furnace process steps.

  19. Impact of temperature on performance of series and parallel connected mono-crystalline silicon solar cells

    Directory of Open Access Journals (Sweden)

    Subhash Chander

    2015-11-01

    Full Text Available This paper presents a study on impact of temperature on the performance of series and parallel connected mono-crystalline silicon (mono-Si solar cell employing solar simulator. The experiment was carried out at constant light intensity 550 W/m2with cell temperature in the range 25–60 oC for single, series and parallel connected mono-Si solar cells. The performance parameters like open circuit voltage, maximum power, fill factor and efficiency are found to decrease with cell temperature while the short circuit current is observed to increase. The experimental results reveal that silicon solar cells connected in series and parallel combinations follow the Kirchhoff’s laws and the temperature has a significant effect on the performance parameters of solar cell.

  20. Dissolution chemistry and biocompatibility of single-crystalline silicon nanomembranes and associated materials for transient electronics.

    Science.gov (United States)

    Hwang, Suk-Won; Park, Gayoung; Edwards, Chris; Corbin, Elise A; Kang, Seung-Kyun; Cheng, Huanyu; Song, Jun-Kyul; Kim, Jae-Hwan; Yu, Sooyoun; Ng, Joanne; Lee, Jung Eun; Kim, Jiyoung; Yee, Cassian; Bhaduri, Basanta; Su, Yewang; Omennetto, Fiorenzo G; Huang, Yonggang; Bashir, Rashid; Goddard, Lynford; Popescu, Gabriel; Lee, Kyung-Mi; Rogers, John A

    2014-06-24

    Single-crystalline silicon nanomembranes (Si NMs) represent a critically important class of material for high-performance forms of electronics that are capable of complete, controlled dissolution when immersed in water and/or biofluids, sometimes referred to as a type of "transient" electronics. The results reported here include the kinetics of hydrolysis of Si NMs in biofluids and various aqueous solutions through a range of relevant pH values, ionic concentrations and temperatures, and dependence on dopant types and concentrations. In vitro and in vivo investigations of Si NMs and other transient electronic materials demonstrate biocompatibility and bioresorption, thereby suggesting potential for envisioned applications in active, biodegradable electronic implants.

  1. The radiation damage of crystalline silicon PN diode in tritium beta-voltaic battery.

    Science.gov (United States)

    Lei, Yisong; Yang, Yuqing; Liu, Yebing; Li, Hao; Wang, Guanquan; Hu, Rui; Xiong, Xiaoling; Luo, Shunzhong

    2014-08-01

    A tritium beta-voltaic battery using a crystalline silicon convertor composed of (100)Si/SiO2/Si3N4 film degrades remarkably with radiation from a high intensity titanium tritide film. Simulation and experiments were carried out to investigate the main factor causing the degradation. The radiation damages mainly comes from the x-ray emitted from the titanium tritide film and beta particle can relieve the damages. The x-ray radiation induced positive charges in the SiO2 film destroying the output property of the PN diode with the induction of an electric field.

  2. The formation of the positive, fixed charge at c-Si(111)/a-Si$_3$N$_{3.5}$:H interfaces

    CERN Document Server

    Hintzsche, L E; Marsman, M; Lamers, M W P E; Weeber, A W; Kresse, G

    2015-01-01

    Modern electronic devices are unthinkable without the well-controlled formation of interfaces at heterostructures. These often involve at least one amorphous material. Modeling such interfaces poses a significant challenge, since a meaningful result can only be expected by using huge models or by drawing from many statistically independent samples. Here we report on the results of high throughput calculations for interfaces between crystalline silicon (c-Si) and amorphous silicon nitride (a-Si$_3$N$_{3.5}$:H), which are omnipresent in commercially available solar cells. The findings reconcile only partly understood key features. At the interface, threefold coordinated Si atoms are present. These are caused by the structural mismatch between the amorphous and crystalline part. The local Fermi level of undoped c-Si lies well below that of a-SiN:H. To align the Fermi levels in the device, charge is transferred from the a-SiN:H part to the c-Si part resulting in an abundance of positively charged, threefold coord...

  3. Dry technologies for the production of crystalline silicon solar cells; Trockentechnologien zur Herstellung von kristallinen Siliziumsolarzellen

    Energy Technology Data Exchange (ETDEWEB)

    Rentsch, J.

    2005-04-15

    Within this work, dynamic plasma etching technologies for the industrial production of crystalline silicon solar cells has been investigated. The research activity can be separated into three major steps: the characterisation of the etching behaviour of a newly developed dynamic plasma etching system, the development and analysis of dry etching processes for solar cell production and the determination of the ecological and economical impacts of such a new technology compared to standard up to date technologies. The characterisation of the etching behaviour has been carried out for two different etching sources, a low frequency (110 kHz) and a microwave (2.45 GHz) plasma source. The parameter of interest was the delivered ion energy of each source mainly determining the reachable etch rate. The etch rate turned out to be the main most critical parameter concerning the reachable wafer throughput per hour. Other points of interest in characterisation of the etching system were the material of the transport carriers, the silicon load as well as the process temperatures. The development of different dry etching processes targets the design of a complete dry production process for crystalline silicon solar cells. Therefore etching processes for saw damage removal, texturing, edge isolation as well as etching of dielectric layers have been developed and optimised. The major benefits of a complete dry production process would be the reduction of handling steps in between process steps and therefore offers a large cost reduction potential. For multicrystalline silicon solar cells a cost reduction potential of 5 % compared to a standard wet chemical based reference process could be realized only including the dry etching of a phosphorus silicate glass layer after diffusion. Further reduction potential offers the implementation of a dry texturing process due to a significant efficiency increase. (orig.)

  4. Recycling WEEE: Extraction and concentration of silver from waste crystalline silicon photovoltaic modules.

    Science.gov (United States)

    Dias, Pablo; Javimczik, Selene; Benevit, Mariana; Veit, Hugo; Bernardes, Andréa Moura

    2016-11-01

    Photovoltaic modules (or panels) are important power generators with limited lifespans. The modules contain known pollutants and valuable materials such as silicon, silver, copper, aluminum and glass. Thus, recycling such waste is of great importance. To date, there have been few published studies on recycling silver from silicon photovoltaic panels, even though silicon technology represents the majority of the photovoltaic market. In this study, the extraction of silver from waste modules is justified and evaluated. It is shown that the silver content in crystalline silicon photovoltaic modules reaches 600g/t. Moreover, two methods to concentrate silver from waste modules were studied, and the use of pyrolysis was evaluated. In the first method, the modules were milled, sieved and leached in 64% nitric acid solution with 99% sodium chloride; the silver concentration yield was 94%. In the second method, photovoltaic modules were milled, sieved, subjected to pyrolysis at 500°C and leached in 64% nitric acid solution with 99% sodium chloride; the silver concentration yield was 92%. The first method is preferred as it consumes less energy and presents a higher yield of silver. This study shows that the use of pyrolysis does not assist in the extraction of silver, as the yield was similar for both methods with and without pyrolysis.

  5. Preservation of Seed Crystals in Feedstock Melting for Cast Quasi-Single Crystalline Silicon Ingots

    Directory of Open Access Journals (Sweden)

    Zaoyang Li

    2013-01-01

    Full Text Available The preservation of seed crystals is important for the casting of quasi-single crystalline (QSC silicon ingots. We carried out transient global simulations of the feedstock melting process in an industrial-sized directional solidification (DS furnace to investigate key factors influencing seed preservation. The power distribution between the top and side heaters is adjusted in the conventional furnace for multicrystalline silicon ingots and in the evolved furnace with a partition block for QSC silicon ingots. The evolution of the solid-liquid interface for melting and the temperature distribution in the furnace core area are analyzed. The power distribution can influence the temperature gradient in the silicon domain significantly. However, its effect on seed preservation is limited in both furnaces. Seed crystals can be preserved in the evolved furnace, as the partition block reduces the radiant heat flux from the insulation walls to the heat exchange block and prevents the heat flowing upwards under the crucible. Therefore, the key to seed preservation is to control radiant heat transfer in the DS furnace and guarantee downward heat flux under the crucible.

  6. Optical properties and surface damage studies of crystalline silicon caused by swift iron ions

    Energy Technology Data Exchange (ETDEWEB)

    Dubey, S.K., E-mail: skdubey@physics.mu.ac.in

    2016-05-15

    p-Type silicon samples irradiated with 70 MeV {sup 56}Fe{sup 5+} ions for various fluences varying between 5 × 10{sup 12} and 4 × 10{sup 14} ions cm{sup −2} have been studied using spectroscopic ellipsometry and Fourier transform infrared spectroscopy. The microstructure of the irradiated samples was modeled from ellipsometric data, using a multilayer optical model and Bruggeman effective medium approximation. The values of pseudodielectric function, absorption coefficient and Penn gap energy were determined with respect to ion fluence. The effective medium analysis suggests that the superficial silicon layer can be explained as a mixture of crystalline and damaged silicon. The thickness of the damaged layer and percentage of voids present in the layer were found to increase with increase in the ion fluence. The effect of disorder on the interband optical spectra, especially on the critical point E{sub 1} at 3.4 eV was found to vary with ion fluence. A red shift in the critical point E{sub 1} with increasing ion fluence was observed. FTIR study showed of silicon samples irradiated with 70 MeV {sup 56}Fe{sup 5+} ions produced the oscillations in the spectral region 1000–400 cm{sup −1}. As irradiated sample showed more pronounced fringes, while contrast of the fringes and amplitude both were found to decrease with increase in depth.

  7. Nano-Photonic Structures for Light Trapping in Ultra-Thin Crystalline Silicon Solar Cells

    Science.gov (United States)

    Pathi, Prathap; Peer, Akshit; Biswas, Rana

    2017-01-01

    Thick wafer-silicon is the dominant solar cell technology. It is of great interest to develop ultra-thin solar cells that can reduce materials usage, but still achieve acceptable performance and high solar absorption. Accordingly, we developed a highly absorbing ultra-thin crystalline Si based solar cell architecture using periodically patterned front and rear dielectric nanocone arrays which provide enhanced light trapping. The rear nanocones are embedded in a silver back reflector. In contrast to previous approaches, we utilize dielectric photonic crystals with a completely flat silicon absorber layer, providing expected high electronic quality and low carrier recombination. This architecture creates a dense mesh of wave-guided modes at near-infrared wavelengths in the absorber layer, generating enhanced absorption. For thin silicon (100 μm) cells. There is potential for 20 μm thick cells to provide 30 mA/cm2 photo-current and >20% efficiency. This architecture has great promise for ultra-thin silicon solar panels with reduced material utilization and enhanced light-trapping. PMID:28336851

  8. Nano-Photonic Structures for Light Trapping in Ultra-Thin Crystalline Silicon Solar Cells.

    Science.gov (United States)

    Pathi, Prathap; Peer, Akshit; Biswas, Rana

    2017-01-13

    Thick wafer-silicon is the dominant solar cell technology. It is of great interest to develop ultra-thin solar cells that can reduce materials usage, but still achieve acceptable performance and high solar absorption. Accordingly, we developed a highly absorbing ultra-thin crystalline Si based solar cell architecture using periodically patterned front and rear dielectric nanocone arrays which provide enhanced light trapping. The rear nanocones are embedded in a silver back reflector. In contrast to previous approaches, we utilize dielectric photonic crystals with a completely flat silicon absorber layer, providing expected high electronic quality and low carrier recombination. This architecture creates a dense mesh of wave-guided modes at near-infrared wavelengths in the absorber layer, generating enhanced absorption. For thin silicon (100 μm) cells. There is potential for 20 μm thick cells to provide 30 mA/cm² photo-current and >20% efficiency. This architecture has great promise for ultra-thin silicon solar panels with reduced material utilization and enhanced light-trapping.

  9. Non-linear optical functions of crystalline-Si resulting from nanoscale layered systems

    Energy Technology Data Exchange (ETDEWEB)

    Kuznicki, Z.T. [Laboratoire PHASE, CNRS UPR 292, 23 rue du Loess, F-67037 Strasbourg cedex 2 (France)]. E-mail: kuznicki@phase.c-strasbourg.fr; Ley, M. [Laboratoire PHASE, CNRS UPR 292, 23 rue du Loess, F-67037 Strasbourg cedex 2 (France); Lezec, H.J. [ISIS, ULP, 8 allee Gaspard Monge, F-67083 Strasbourg cedex (France); Sarrabayrouse, G. [LAAS-CNRS, 7 av. du colonel Roche, 31077 Toulouse cedex 4 (France); Rousset, B. [LAAS-CNRS, 7 av. du colonel Roche, 31077 Toulouse cedex 4 (France); Rossel, F. [LAAS-CNRS, 7 av. du colonel Roche, 31077 Toulouse cedex 4 (France); Migeon, H. [LAM, Centre de Recherche Public - Gabriel Lippmann, 162a, av. de la Faiaencerie, L-1511 Luxembourg (Luxembourg); Wirtz, T. [LAM, Centre de Recherche Public - Gabriel Lippmann, 162a, av. de la Faiaencerie, L-1511 Luxembourg (Luxembourg)

    2006-07-15

    New non-linear optoelectronic and photovoltaic behavior of crystalline silicon (c-Si) has been obtained with a strained nanoscale Si-layered system. We have found c-Si absorptances that even exceed values of amorphous silicon (a-Si) thin films. The present investigation exploits charge carrier and photon flux transformations at the so-called carrier collection limit. A correlation between free carrier density and the absorption coefficient could be established by combining reflectivity and transmissivity measurements on samples having different surface free carrier reservoirs. In summary, Si modifications implemented on the nanoscale lead to new effects that can widen applications of conventional Si devices.

  10. Optimizing polymorphous silicon back surface field of a-Si(n)/c-Si(p) heterojunction solar cells by simulation%a-Si(n)/c-Si(P)异质结太阳电池薄膜硅背场的模拟优化

    Institute of Scientific and Technical Information of China (English)

    赵雷; 周春兰; 李海玲; 刁宏伟; 王文静

    2008-01-01

    采用AFORS-HET数值模拟软件,对不同带隙的薄膜硅材料在a-Si(n)/c-Si(p)异质结太阳电池上的背场效果进行了模拟,分析了影响背场效果的原因,得到了薄膜硅背场在a-Si(n)/c-Si(p)异质结太阳电池上的适用条件为薄膜硅材料是带隙1.6eV,硼掺杂浓度在1018cm-3以上的微晶硅材料,其最佳厚度在5nm左右.这种背场从工艺上易于实现,并且,与常用的Al扩散背场相比,在相同的掺杂浓度下,电池效率可以大大提高.

  11. Enhanced cooling in mono-crystalline ultra-thin silicon by embedded micro-air channels

    KAUST Repository

    Ghoneim, Mohamed T.

    2015-12-11

    In today’s digital world, complementary metal oxide semiconductor (CMOS) technology enabled scaling of bulk mono-crystalline silicon (100) based electronics has resulted in their higher performance but with increased dynamic and off-state power consumption. Such trade-off has caused excessive heat generation which eventually drains the charge of battery in portable devices. The traditional solution utilizing off-chip fans and heat sinks used for heat management make the whole system bulky and less mobile. Here we show, an enhanced cooling phenomenon in ultra-thin (>10 μm) mono-crystalline (100) silicon (detached from bulk substrate) by utilizing deterministic pattern of porous network of vertical “through silicon” micro-air channels that offer remarkable heat and weight management for ultra-mobile electronics, in a cost effective way with 20× reduction in substrate weight and a 12% lower maximum temperature at sustained loads. We also show the effectiveness of this event in functional MOS field effect transistors (MOSFETs) with high-κ/metal gate stacks.

  12. Thermal conductivity reduction of crystalline silicon by high-pressure torsion.

    Science.gov (United States)

    Harish, Sivasankaran; Tabara, Mitsuru; Ikoma, Yoshifumi; Horita, Zenji; Takata, Yasuyuki; Cahill, David G; Kohno, Masamichi

    2014-01-01

    We report a dramatic and irreversible reduction in the lattice thermal conductivity of bulk crystalline silicon when subjected to intense plastic strain under a pressure of 24 GPa using high-pressure torsion (HPT). Thermal conductivity of the HPT-processed samples were measured using picosecond time domain thermoreflectance. Thermal conductivity measurements show that the HPT-processed samples have a lattice thermal conductivity reduction by a factor of approximately 20 (from intrinsic single crystalline value of 142 Wm(-1) K(-1) to approximately 7.6 Wm(-1) K(-1)). Thermal conductivity reduction in HPT-processed silicon is attributed to the formation of nanograin boundaries and metastable Si-III/XII phases which act as phonon scattering sites, and because of a large density of lattice defects introduced by HPT processing. Annealing the samples at 873 K increases the thermal conductivity due to the reduction in the density of secondary phases and lattice defects.

  13. Optimization of oxidation processes to improve crystalline silicon solar cell emitters

    Directory of Open Access Journals (Sweden)

    L. Shen

    2014-02-01

    Full Text Available Control of the oxidation process is one key issue in producing high-quality emitters for crystalline silicon solar cells. In this paper, the oxidation parameters of pre-oxidation time, oxygen concentration during pre-oxidation and pre-deposition and drive-in time were optimized by using orthogonal experiments. By analyzing experimental measurements of short-circuit current, open circuit voltage, series resistance and solar cell efficiency in solar cells with different sheet resistances which were produced by using different diffusion processes, we inferred that an emitter with a sheet resistance of approximately 70 Ω/□ performed best under the existing standard solar cell process. Further investigations were conducted on emitters with sheet resistances of approximately 70 Ω/□ that were obtained from different preparation processes. The results indicate that emitters with surface phosphorus concentrations between 4.96 × 1020 cm−3 and 7.78 × 1020 cm−3 and with junction depths between 0.46 μm and 0.55 μm possessed the best quality. With no extra processing, the final preparation of the crystalline silicon solar cell efficiency can reach 18.41%, which is an increase of 0.4%abs compared to conventional emitters with 50 Ω/□ sheet resistance.

  14. Simultaneous high crystallinity and sub-bandgap optical absorptance in hyperdoped black silicon using nanosecond laser annealing

    Energy Technology Data Exchange (ETDEWEB)

    Franta, Benjamin, E-mail: bafranta@gmail.com; Pastor, David; Gandhi, Hemi H.; Aziz, Michael J.; Mazur, Eric [School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States); Rekemeyer, Paul H.; Gradečak, Silvija [Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)

    2015-12-14

    Hyperdoped black silicon fabricated with femtosecond laser irradiation has attracted interest for applications in infrared photodetectors and intermediate band photovoltaics due to its sub-bandgap optical absorptance and light-trapping surface. However, hyperdoped black silicon typically has an amorphous and polyphasic polycrystalline surface that can interfere with carrier transport, electrical rectification, and intermediate band formation. Past studies have used thermal annealing to obtain high crystallinity in hyperdoped black silicon, but thermal annealing causes a deactivation of the sub-bandgap optical absorptance. In this study, nanosecond laser annealing is used to obtain high crystallinity and remove pressure-induced phases in hyperdoped black silicon while maintaining high sub-bandgap optical absorptance and a light-trapping surface morphology. Furthermore, it is shown that nanosecond laser annealing reactivates the sub-bandgap optical absorptance of hyperdoped black silicon after deactivation by thermal annealing. Thermal annealing and nanosecond laser annealing can be combined in sequence to fabricate hyperdoped black silicon that simultaneously shows high crystallinity, high above-bandgap and sub-bandgap absorptance, and a rectifying electrical homojunction. Such nanosecond laser annealing could potentially be applied to non-equilibrium material systems beyond hyperdoped black silicon.

  15. Lightweight C/SiC mirrors for space application

    Science.gov (United States)

    Zhou, Hao; Zhang, Chang-rui; Cao, Ying-bin; Zhou, Xin-gui

    2006-02-01

    Challenges in high resolution space telescopes have led to the desire to create large primary mirror apertures. Ceramic mirrors and complex structures are becoming more important for high precision lightweight optical applications in adverse environments. Carbon-fiber reinforced silicon carbide (C/SiC) has shown great potential to be used as mirror substrate. This material has a high stiffness to weight ratio, dimensional stability from ambient to cryo temperatures, and thermal conductivity, low thermal expansion as well. These properties make C/SiC very attractive for a variety of applications in precision optical structures, especially when considering space-borne application. In this paper, lightweight C/SiC mirror prepared for a scan mirror of a high resolution camera is presented. The manufacturing of C/SiC mirror starts with a porous rigid felt made of short chopped carbon fibers. The fibers are molded with phenolic resin under pressure to form a carbon fiber reinforced plastic blank, followed by a pyrolization process by which the phenolic resin reacts to a carbon matrix. The C/C-felt can be machined by standard computer controlled milling techniques to any virtual shape. This is one of the most significant advantages of this material, as it drastically reduces the making costs and enables the manufacture of truly ultra-lightweight mirrors, reflectors and structures. Upon completion of milling, the C/C-felt preform is mounted in a high-temperature furnace together with silicon and heated under vacuum condition to 1500°C at which the silicon changes into liquid phase. Subsequently, the molten silicon is infiltrated into the porous preform under capillary forces to react with carbon matrix and the surfaces of the carbon fibers to form a density C/SiC substrate. The C/SiC material retains the preform shape to within a tight tolerance after sintering means the ceramization process is a nearly net shaping process. Reactive melt infiltrated C/SiC, followed by

  16. Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

    Science.gov (United States)

    Kumar, Kitty; Lee, Kenneth K. C.; Nogami, Jun; Herman, Peter R.; Kherani, Nazir P.

    2013-03-01

    This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si) into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

  17. Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

    Directory of Open Access Journals (Sweden)

    Nogami Jun

    2013-03-01

    Full Text Available This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

  18. Interaction between helium and intrinsic point defects in 3C-SiC single crystal

    Science.gov (United States)

    Sun, Dan; Li, Ruihuan; Ding, Jianhua; Zhang, Pengbo; Wang, Yuanyuan; Zhao, Jijun

    2017-06-01

    Silicon carbide (SiC) is a candidate structural material for fission and fusion reactors as well as an important wide band-gap semiconductor for electronic devices. Using first-principles calculations, we systemically investigate the energetics and stability of helium (He) atoms and intrinsic point defects inside single-crystalline 3C-SiC. We find that the formation energy of interstitial He is lower than those of point defects. Inside 3C-SiC, the He-C interaction is stronger than He-Si. Hence, the interstitial He atom in the Si tetrahedral site has a stronger interaction with the six C atoms in the second nearest neighbor than the four nearest neighboring Si atoms. For interstitial He atoms, the equilibrium He-He distance is about 1.81 Å with a weak attraction of 0.09 eV. According to the binding energies of Hen (n = 2-4) clusters, He interstitials can form He bubbles without involving other types of structural defects. Moreover, a Si (C) monovacancy can accommodate up to 11 (9) He atoms. The Hen clusters trapped in the Si or C monovacancy induce large internal pressure in the order of magnitude of GPa and thus facilitate the creation of a new vacancy at the nearby lattice site.

  19. Surface chemical-bonds analysis of silicon particles from diamond-wire cutting of crystalline silicon

    Science.gov (United States)

    Benayad, Anass; Hajjaji, Hamza; Coustier, Fabrice; Benmansour, Malek; Chabli, Amal

    2016-12-01

    The recycling of the Si powder resulting from the kerf loss during silicon ingot cutting into wafers for photovoltaic application shows both significant and achievable economic and environmental benefits. A combined x-ray photoelectron spectroscopy (XPS), attenuated total reflection (ATR)-Fourier transform infrared (FTIR) and micro-Raman spectral analyses were applied to kerf-loss Si powders reclaimed from the diamond wire cutting using different cutting fluids. These spectroscopies performed in suitable configurations for the analysis of particles, yield detailed insights on the surface chemical properties of the powders demonstrating the key role of the cutting fluid nature. A combined XPS core peak, plasmon loss, and valence band study allow assessing a qualitative and quantitative chemical, structural change of the kerf-loss Si powders. The relative contribution of the LO and TO stretching modes to the Si-O-Si absorption band in the ATR-FTIR spectra provide a consistent estimation of the effective oxidation level of the Si powders. The change in the cutting media from deionized water to city water, induces a different silicon oxide layer thickness at the surface of the final kerf-loss Si, depending on the powder reactivity to the media. The surfactant addition induces an enhanced carbon contamination in the form of grafted carbonated species on the surface of the particles. The thickness of the modified surface, depending on the cutting media, was estimated based on a simple model derived from the combined XPS core level and plasmon peak intensities. The effective nature of these carbonated species, sensitive to the water quality, was evidenced based on coupled XPS core peak and valence band study. The present work paves the way to a controlled process to reclaim the kerf-loss Si powder without heavy chemical etching steps.

  20. Laser fabrication of crystalline silicon nanoresonators from an amorphous film for low-loss all-dielectric nanophotonics

    CERN Document Server

    Dmitriev, P A; Milichko, V A; Mukhin, I S; Gudovskikh, A S; Sitnikova, A A; Samusev, A K; Krasnok, A E; Belov, P A

    2015-01-01

    The concept of high refractive index subwavelength dielectric nanoresonators, supporting electric and magnetic optical resonances, is a promising platform for waveguiding, sensing, and nonlinear nanophotonic devices. However, high concentration of defects in the nanoresonators diminishes their resonant properties, which are crucially dependent on their internal losses. Therefore, it seems to be inevitable to use initially crystalline materials for fabrication of the nanoresonators. Here, we show that the fabrication of crystalline (low-loss) resonant silicon nanoparticles by femtosecond laser ablation of amorphous (high-loss) silicon thin films is possible. We apply two conceptually different approaches: recently proposed laser-induced transfer and a novel laser writing technique for large-scale fabrication of the crystalline nanoparticles. The crystallinity of the fabricated nanoparticles is proven by Raman spectroscopy and electron transmission microscopy, whereas optical resonant properties of the nanopart...

  1. Laser fabrication of crystalline silicon nanoresonators from an amorphous film for low-loss all-dielectric nanophotonics

    Science.gov (United States)

    Dmitriev, P. A.; Makarov, S. V.; Milichko, V. A.; Mukhin, I. S.; Gudovskikh, A. S.; Sitnikova, A. A.; Samusev, A. K.; Krasnok, A. E.; Belov, P. A.

    2016-02-01

    The concept of high refractive index subwavelength dielectric nanoresonators, supporting electric and magnetic optical resonance, is a promising platform for waveguiding, sensing, and nonlinear nanophotonic devices. However, high concentration of defects in the nanoresonators diminishes their resonant properties, which are crucially dependent on their internal losses. Therefore, it seems to be inevitable to use initially crystalline materials for fabrication of the nanoresonators. Here, we show that the fabrication of crystalline (low-loss) resonant silicon nanoparticles by femtosecond laser ablation of amorphous (high-loss) silicon thin films is possible. We apply two conceptually different approaches: recently proposed laser-induced transfer and a novel laser writing technique for large-scale fabrication of the crystalline nanoparticles. The crystallinity of the fabricated nanoparticles is proven by Raman spectroscopy and electron transmission microscopy, whereas optical resonant properties of the nanoparticles are studied using dark-field optical spectroscopy and full-wave electromagnetic simulations.

  2. Modeling the splitting of thin silicon films from porosified crystalline silicon upon high temperature annealing in hydrogen

    Energy Technology Data Exchange (ETDEWEB)

    Ghannam, Moustafa Y.; Raheem, Yaser Abdul; Alomar, Abdul Azeez [EE Department, College of Engineering and Petroleum, Kuwait University, Safat (Kuwait); Poortmans, Jef [IMEC, Leuven (Belgium)

    2012-10-15

    The role of hydrogen in promoting thin film splitting from crystalline silicon wafers with pores or trenches during high temperature annealing is investigated. During the treatment, trenches are transformed into spherical voids that may laterally channel and split off the substrate. It is shown that the conditions necessary for hydrogen to contribute to the establishment of high stress levels around transformed voids or of pressure inside the voids are usually not satisfied. Hence promoting void coalescence by substantial void volume growth resulting from stress enhanced vacancy diffusion and/or exfoliation of separated voids are unlikely to occur. Also, there are no experimental evidence that confirms the role of hydrogen in triggering premature void collapse by Griffith fracture at relatively lower stress levels in conjunction with reduced surface energy. Therefore, it is concluded that splitting occurs during high temperature annealing only when neighboring voids are close enough to systematically coalesce. In that case, hydrogen may react at high temperature with the internal silicon surface of the voids (walls) and contribute to breaking the thin straps separating the voids which promotes channelling and film splitting (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Effective surface passivation of p-type crystalline silicon with silicon oxides formed by light-induced anodisation

    Energy Technology Data Exchange (ETDEWEB)

    Cui, Jie, E-mail: j.cui@unsw.edu.au [School of Photovoltaic and Renewable Energy Engineering, The University of New South Wales, Sydney 2052 (Australia); Grant, Nicholas [Centre for Sustainable Energy Systems, Australian National University, Canberra, A.C.T. 0200 (Australia); Lennon, Alison [School of Photovoltaic and Renewable Energy Engineering, The University of New South Wales, Sydney 2052 (Australia)

    2014-12-30

    Highlights: • The surface passivation by anodic SiO{sub 2} formed by light-induced anodisation is investigated. • The anodic SiO{sub 2} grows lower temperatures with shorter growth times. After annealing in oxygen and then forming gas the effective minority carrier lifetime is increased to 150 μs. • It shows a very low positive Q{sub eff} of 3.4 × 10{sup 11} cm{sup −2}, a moderate D{sub it} of 6 × 10{sup 11} eV{sup −1} cm{sup −2}. • It has a very low leakage current density suggesting its application in solar cell as a functional dielectric. - Abstract: Electronic surface passivation of p-type crystalline silicon by anodic silicon dioxide (SiO{sub 2}) was investigated. The anodic SiO{sub 2} was grown by light-induced anodisation (LIA) in diluted sulphuric acid at room temperature, a process that is significantly less-expensive than thermal oxidation which is widely-used in silicon solar cell fabrication. After annealing in oxygen and then forming gas at 400 °C for 30 min, the effective minority carrier lifetime of 3–5 Ω cm, boron-doped Czochralski silicon wafers with a phosphorus-doped 80 Ω/□ emitter and a LIA anodic SiO{sub 2} formed on the p-type surface was increased by two orders of magnitude to 150 μs. Capacitance–voltage measurements demonstrated a very low positive charge density of 3.4 × 10{sup 11} cm{sup −2} and a moderate density of interface states of 6 × 10{sup 11} eV{sup −1} cm{sup −2}. This corresponded to a silicon surface recombination velocity of 62 cm s{sup −1}, which is comparable with values reported for other anodic SiO{sub 2} films, which required higher temperatures and longer growth times, and significantly lower than oxides grown by chemical vapour deposition techniques. Additionally, a very low leakage current density of 3.5 × 10{sup −10} and 1.6 × 10{sup −9} A cm{sup −2} at 1 and −1 V, respectively, was measured for LIA SiO{sub 2} suggesting its potential application as insulation layer in

  4. Correlation Between the Raman Crystallinity of p-Type Micro-Crystalline Silicon Layer and Open Circuit Voltage of n-i-p Solar Cells.

    Science.gov (United States)

    Jung, Junhee; Kim, Sunbo; Park, Jinjoo; Shin, Chonghoon; Pham, Duy Phong; Kim, Jiwoong; Chung, Sungyoun; Lee, Youngseok; Yi, Junsin

    2015-10-01

    This article mainly discusses the difference between p-i-n and n-i-p type solar cells. Their structural difference has an effect on cell performance, such as open circuit voltage and fill factor. Although the deposition conditions are the same for both p-i-n and n-i-p cases, the substrate layers for depositing p-type microcrystalline silicon layers differ. In n-i-p cells, the substrate layer is p-type amorphous silicon oxide layer; whereas, in p-i-n cells, the substrate layer is ZnO:Al. The interfacial change leads to a 12% difference in the crystallinity of the p-type microcrystalline silicon layers. When the p-type microcrystalline silicon layer's crystallinity was not sufficient to activate an internal electric field, the open circuit voltage and fill factor decreased 0.075 V and 7.36%, respectively. We analyzed this problem by comparing the Raman spectra, electrical conductivity, activation energy and solar cell performance. By adjusting the thickness of the p-type microcrystalline silicon layer, we increased the open circuit voltage of the n-i-p cell from 0.835 to 0.91 V.

  5. The Synthesis and Structural Properties of Crystalline Silicon Quantum Dots upon Thermal Annealing of Hydrogenated Amorphous Si-Rich Silicon Carbide Films

    Science.gov (United States)

    Wen, Guozhi; Zeng, Xiangbin; Li, Xianghu

    2016-08-01

    Silicon quantum dots (QDs) embedded in non-stoichiometric hydrogenated silicon carbide (SiC:H) thin films have been successfully synthesized by plasma-enhanced chemical vapor deposition and post-annealing. The chemical composition analyses have been carried out by x-ray photoelectron spectroscopy (XPS). The bonding configurations have been deduced from Fourier transform infrared absorption measurements (FTIR). The evolution of microstructure with temperature has been characterized by glancing incident x-ray diffraction (XRD) and Raman diffraction spectroscopy. XPS and FTIR show that it is in Si-rich feature and there are a few hydrogenated silicon clusters in the as-grown sample. XRD and Raman diffraction spectroscopy show that it is in amorphous for the as-grown sample, while crystalline silicon QDs have been synthesized in the 900°C annealed sample. Silicon atoms precipitation from the SiC matrix or silicon phase transition from amorphous SiC is enhanced with annealing temperature increase. The average sizes of silicon QDs are about 5.1 nm and 5.6 nm, the number densities are as high as 1.7 × 1012 cm-2 and 3.2 × 1012 cm-2, and the crystalline volume fractions are about 58.3% and 61.3% for the 900°C and 1050°C annealed samples, respectively. These structural properties analyses provide an understanding about the synthesis of silicon QDs upon thermal annealing for applications in next generation optoelectronic and photovoltaic devices.

  6. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating.

    Science.gov (United States)

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-28

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  7. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating

    Science.gov (United States)

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-01

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  8. Deposited low temperature silicon GHz modulator

    CERN Document Server

    Lee, Yoon Ho Daniel; Lipson, Michal

    2013-01-01

    The majority of silicon photonics is built on silicon-on-insulator (SOI) wafers while the majority of electronics, including CPUs and memory, are built on bulk silicon wafers, limiting broader acceptance of silicon photonics. This discrepancy is a result of silicon photonics's requirement for a single-crystalline silicon (c-Si) layer and a thick undercladding for optical guiding that bulk silicon wafers to not provide. While the undercladding problem can be partially addressed by substrate removal techniques, the complexity of co-integrating photonics with state-of-the-art transistors and real estate competition between electronics and photonics remain problematic. We show here a platform for deposited GHz silicon photonics based on polycrystalline silicon with high optical quality suitable for high performance electro-optic devices. We demonstrate 3 Gbps polysilicon electro-optic modulator fabricated on a deposited polysilicon layer fully compatible with CMOS backend integration. These results open up an arr...

  9. Improving the performance of amorphous and crystalline silicon heterojunction solar cells by monitoring surface passivation

    Energy Technology Data Exchange (ETDEWEB)

    Schuettauf, J.W.A.; Van der Werf, C.H.M.; Kielen, I.M.; Van Sark, W.G.J.H.M.; Rath, J.K.; Schropp, R.E.I. [Utrecht University, Debye Institute for Nanomaterials Science, Nanophotonics, Physics of Devices, Princetonplein 5, 3584 CC Utrecht (Netherlands)

    2012-09-15

    The influence of thermal annealing on the crystalline silicon surface passivating properties of selected amorphous silicon containing layer stacks (including intrinsic and doped films), as well as the correlation with silicon heterojunction solar cell performance has been investigated. All samples have been isochronally annealed for 1 h in an N{sub 2} ambient at temperatures between 150C and 300C in incremental steps of 15C. For intrinsic films and intrinsic/n-type stacks, an improvement in passivation quality is observed up to 255C and 270C, respectively, and a deterioration at higher temperatures. For intrinsic/n-type a-Si:H layer stacks, a maximum minority carrier lifetime of 13.3 ms at an injection level of 10{sup 15} cm{sup -3} has been measured. In contrast, for intrinsic/p-type a-Si:H layer stacks, a deterioration in passivation is observed upon annealing over the whole temperature range. Comparing the lifetime values and trends for the different layer stacks to the performance of the corresponding cells, it is inferred that the intrinsic/p-layer stack is limiting device performance. Furthermore, thermal annealing of p-type layers should be avoided entirely. We therefore propose an adapted processing sequence, leading to a substantial improvement in efficiency to 16.7%, well above the efficiency of 15.8% obtained with the 'standard' processing sequence.

  10. Nickel Electroless Plating: Adhesion Analysis for Mono-Type Crystalline Silicon Solar Cells.

    Science.gov (United States)

    Shin, Eun Gu; Rehman, Atteq ur; Lee, Sang Hee; Lee, Soo Hong

    2015-10-01

    The adhesion of the front electrodes to silicon substrate is the most important parameters to be optimized. Nickel silicide which is formed by sintering process using a silicon substrate improves the mechanical and electrical properties as well as act as diffusion barrier for copper. In this experiment p-type mono-crystalline czochralski (CZ) silicon wafers having resistivity of 1.5 Ω·cm were used to study one step and two step nickel electroless plating process. POCl3 diffusion process was performed to form the emitter with the sheet resistance of 70 ohm/sq. The Six, layer was set down as an antireflection coating (ARC) layer at emitter surface by plasma enhanced chemical vapor deposition (PECVD) process. Laser ablation process was used to open SiNx passivation layer locally for the formation of the front electrodes. Nickel was deposited by electroless plating process by one step and two step nickel electroless deposition process. The two step nickel plating was performed by applying a second nickel deposition step subsequent to the first sintering process. Furthermore, the adhesion analysis for both one step and two steps process was conducted using peel force tester (universal testing machine, H5KT) after depositing Cu contact by light induced plating (LIP).

  11. A hybrid life-cycle inventory for multi-crystalline silicon PV module manufacturing in China

    Science.gov (United States)

    Yao, Yuan; Chang, Yuan; Masanet, Eric

    2014-11-01

    China is the world’s largest manufacturer of multi-crystalline silicon photovoltaic (mc-Si PV) modules, which is a key enabling technology in the global transition to renewable electric power systems. This study presents a hybrid life-cycle inventory (LCI) of Chinese mc-Si PV modules, which fills a critical knowledge gap on the environmental implications of mc-Si PV module manufacturing in China. The hybrid LCI approach combines process-based LCI data for module and poly-silicon manufacturing plants with a 2007 China IO-LCI model for production of raw material and fuel inputs to estimate ‘cradle to gate’ primary energy use, water consumption, and major air pollutant emissions (carbon dioxide, methane, sulfur dioxide, nitrous oxide, and nitrogen oxides). Results suggest that mc-Si PV modules from China may come with higher environmental burdens that one might estimate if one were using LCI results for mc-Si PV modules manufactured elsewhere. These higher burdens can be reasonably explained by the efficiency differences in China’s poly-silicon manufacturing processes, the country’s dependence on highly polluting coal-fired electricity, and the expanded system boundaries associated with the hybrid LCI modeling framework. The results should be useful for establishing more conservative ranges on the potential ‘cradle to gate’ impacts of mc-Si PV module manufacturing for more robust LCAs of PV deployment scenarios.

  12. Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid–Gas Phase Epitaxy on Si (111

    Directory of Open Access Journals (Sweden)

    Kukushkin SA

    2010-01-01

    Full Text Available Abstract A series of 3C-SiC films have been grown by a novel method of solid–gas phase epitaxy and studied by Raman scattering and scanning electron microscopy (SEM. It is shown that during the epitaxial growth in an atmosphere of CO, 3C-SiC films of high crystalline quality, with a thickness of 20 nm up to few hundreds nanometers can be formed on a (111 Si wafer, with a simultaneous growth of voids in the silicon substrate under the SiC film. The presence of these voids has been confirmed by SEM and micro-Raman line-mapping experiments. A significant enhancement of the Raman signal was observed in SiC films grown above the voids, and the mechanisms responsible for this enhancement are discussed.

  13. Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3

    Science.gov (United States)

    Terlinden, N. M.; Dingemans, G.; van de Sanden, M. C. M.; Kessels, W. M. M.

    2010-03-01

    Al2O3 synthesized by plasma-assisted atomic layer deposition yields excellent surface passivation of crystalline silicon (c-Si) for films down to ˜5 nm in thickness. Optical second-harmonic generation was employed to distinguish between the influence of field-effect passivation and chemical passivation through the measurement of the electric field in the c-Si space-charge region. It is demonstrated that this electric field—and hence the negative fixed charge density—is virtually unaffected by the Al2O3 thickness between 2 and 20 nm indicating that a decrease in chemical passivation causes the reduced passivation performance for <5 nm thick Al2O3 films.

  14. Wide-Range Enhancement of Spectral Response by Highly Conductive and Transparent μc-SiOx:H Doped Layers in μc-Si:H and a-Si:H/μc-Si:H Thin-Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Pei-Ling Chen

    2016-01-01

    Full Text Available The enhancement of optical absorption of silicon thin-film solar cells by the p- and n-type μc-SiOx:H as doped and functional layers was presented. The effects of deposition conditions and oxygen content on optical, electrical, and structural properties of μc-SiOx:H films were also discussed. Regarding the doped μc-SiOx:H films, the wide optical band gap (E04 of 2.33 eV while maintaining a high conductivity of 0.2 S/cm could be obtained with oxygen incorporation of 20 at.%. Compared to the conventional μc-Si:H(p as window layer in μc-Si:H single-junction solar cells, the application of μc-SiOx:H(p increased the VOC and led to a significant enhancement in the short-wavelength spectral response. Meanwhile, the employment of μc-SiOx:H(n instead of conventional ITO as back reflecting layer (BRL enhanced the external quantum efficiency (EQE of μc-Si:H single-junction cell in the long-wavelength region, leading to a relative efficiency gain of 10%. Compared to the reference cell, the optimized a-Si:H/μc-Si:H tandem cell by applying p- and n-type μc-SiOx:H films achieved a VOC of 1.37 V, JSC of 10.55 mA/cm2, FF of 73.67%, and efficiency of 10.51%, which was a relative enhancement of 16%.

  15. Nanometric Cutting of Silicon with an Amorphous-Crystalline Layered Structure: A Molecular Dynamics Study

    Science.gov (United States)

    Wang, Jinshi; Fang, Fengzhou; Zhang, Xiaodong

    2017-01-01

    Materials with specific nanometric layers are of great value in both theoretical and applied research. The nanometric layer could have a significant influence on the response to the mechanical loading. In this paper, the nanometric cutting on the layered systems of silicon has been studied by molecular dynamics. This kind of composite structure with amorphous layer and crystalline substrate is important for nanomachining. Material deformation, stress status, and chip formation, which are the key issues in nano-cutting, are analyzed. A new chip formation mechanism, i.e., the mixture of extrusion and shear, has been observed. In addition, from the perspective of engineering, some specific composite models show the desired properties due to the low subsurface damage or large material removal rate. The results enrich the cutting theory and provide guidance on nanometric machining.

  16. Dual interface gratings design for absorption enhancement in thin crystalline silicon solar cells

    Science.gov (United States)

    Zhang, Jinqiannan; Yu, Zhongyuan; Liu, Yumin; Chai, Hongyu; Hao, Jing; Ye, Han

    2017-09-01

    We numerically study and analyze the light absorption enhancement in thin crystalline silicon solar cell with dual interface gratings. The structure combines the front dielectric nanowalls and the sinusoidal plasmonic grating at back reflector. We show that having specific interfaces with well-chosen period, fill factor and height can allow more efficient dielectric and plasmonic modes coupling into active layer and can improve the solar cell performance. For 1 μm active layer case, the optimal result for the proposed structure achieves short-circuit current of 23.6 mA/cm2, which performs over 50% better than flat solar cell structure, the short-circuit current of which is 15.5 mA/cm2. In addition, the active layer thickness and angular analysis show that the proposed structure maintains its advantage over flat structure.

  17. Phase field modeling of grain structure evolution during directional solidification of multi-crystalline silicon sheet

    Science.gov (United States)

    Lin, H. K.; Lan, C. W.

    2017-10-01

    Evolution of grain structures and grain boundaries (GBs), especially the coincident site lattice GBs, during directional solidification of multi-crystalline silicon sheet are simulated by using a phase field model for the first time. Since the coincident site lattice GBs having lower mobility, tend to follow their own crystallographic directions despite thermal gradients, the anisotropic energy and mobility of GBs are considered in the model. Three basic interactions of GBs during solidification are examined and they are consistent with experiments. The twinning process for new grain formation is further added in the simulation by considering twin nucleation. The effect of initial distribution of GB types and grain orientations is also investigated for the twinning frequency and the evolution of grain size and GB types.

  18. Atomistic simulations of surface coverage effects in anisotropic wet chemical etching of crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Gosalvez, M.A.; Foster, A.S.; Nieminen, R.M

    2002-12-30

    Atomistic simulations of anisotropic wet chemical etching of crystalline silicon have been performed in order to determine the dependence of the etch rates of different crystallographic orientations on surface coverage and clustering of OH radicals. We show that the etch rate is a non-monotonic function of OH coverage and that there always exists a coverage value at which the etch rate reaches a maximum. The dependence of the anisotropy of the etching process on coverage, including the dependence of the fastest-etched plane orientation, is implicitly contained in the model and predictions of convex corner under-etching structures are made. We show that the whole etching process is controlled by only a few surface configurations involving a particular type of next-nearest neighbours. The relative value of the removal probabilities of these confitions determines the balance in the occurrence of step propagation and etch pitting for all surface orientations.

  19. Periodic surface structures on crystalline silicon created by 532 nm picosecond Nd:YAG laser pulses

    Energy Technology Data Exchange (ETDEWEB)

    Trtica, M.S. [Physical Chemistry Department, Vinca Institute of Nuclear Sciences, P.O. BOX 522, 11001 Belgrade (Serbia)], E-mail: etrtica@vin.bg.ac.yu; Gakovic, B.M. [Atomic Physics Department, Vinca Institute of Nuclear Sciences, P.O. BOX 522, 11001 Belgrade (Serbia); Radak, B.B. [Physical Chemistry Department, Vinca Institute of Nuclear Sciences, P.O. BOX 522, 11001 Belgrade (Serbia); Batani, D.; Desai, T.; Bussoli, M. [Dipartimento di Fisica ' G. Occhialini' , Universita degli Studi di Milano Bicocca, Piazza della Scienza 3, 20126 Milano (Italy)

    2007-12-30

    Creation of laser-induced morphology features, particularly laser-induced periodic surface structures (LIPSS), by a 532 nm picosecond Nd:YAG laser on crystalline silicon is reported. The LIPSS, often termed ripples, were produced at average laser irradiation fluences of 0.7, 1.6, and 7.9 J cm{sup -2}. Two types of ripples were registered: micro-ripples (at micrometer scale) in the form of straight parallel lines extending over the entire irradiated spot, and nano-ripples (at nanometer scale), apparently concentric, registered only at the rim of the spot, with the periodicity dependent on laser fluence. There are indications that the parallel ripples are a consequence of the partial periodicity contained in the diffraction modulated laser beam, and the nano-ripples are very likely frozen capillary waves. The damage threshold fluence was estimated at 0.6 J cm{sup -2}.

  20. Summary of the 4th Workshop on Metallization for Crystalline Silicon Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Beaucarne, G. [Dow Corning, Parc Industriel, Zone C, Rue Jules Bordet, 7180 Seneffe (Belgium); Schubert, G. [Sunways AG, Macairestrasse 3 - 5, D - 78467 Konstanz (Germany); Hoornstra, J. [Energy research Centre of the Netherlands ECN, POBox 1, 1755 ZG Petten (Netherlands)

    2013-07-01

    The 4th Metallization Workshop held in May 2013 in Constance, Germany, enabled experts in metallization for crystalline silicon solar cells to obtain a clear view on the status of the technology, as well as to exchange and generate new ideas and insights. From the contributions on the workshop, it was clear that the traditional metallization technique of screenprinting Ag paste has been improved in a dramatic way over the last two years, accelerating the decrease of Ag consumption per cell while improving solar cell efficiency. This was achieved through enhanced understanding of screenprinted contacts, improving Ag pastes and evolutionary modifications to the screenprinting technique. Alternatives to screenprinting, including electroplating of Ni and Cu contacts, also continue to progress, though not quite at the same impressive rate of improvement as Ag printing.

  1. DLTS properties of iron defects in crystalline silicon used in solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Hamadeh, H. [Department of Physics, Atomic Energy Commission of Syria, Solar Cell Group, P.O. Box 6091, Damascus (Syrian Arab Republic)]. E-mail: hhamadeh@aecs.org.sy; Darwich, R. [Department of Physics, Atomic Energy Commission of Syria, Solar Cell Group, P.O. Box 6091, Damascus (Syrian Arab Republic)

    2004-10-25

    Crystalline silicon used in solar cells has been investigated using deep level transient spectroscopy (DLTS). In majority-carrier pulse sequence an interstitial iron deep level was observed. However, the investigation of this deep level peak with different filling pulsewidths shows that this level consists of two superimposed levels. The activation energies of these levels are 375 meV (F{sub 1}) and 480 meV (F{sub 2}). The capture cross section of the level (F{sub 1}) with the lower activation energy is nearly two orders of magnitude larger than the capture cross section of defect F{sub 2}. Both capture cross sections show, over a wide range, no temperature dependence indicating that nonradiative recombination mechanisms other than multiphonon emission are involved. The concentration ratio between both defects is nearly 1:2.

  2. In-Situ Measurement of Power Loss for Crystalline Silicon Modules Undergoing Thermal Cycling and Mechanical Loading Stress Testing

    DEFF Research Database (Denmark)

    Spataru, Sergiu; Hacke, Peter; Sera, Dezso

    We analyze the degradation of multi-crystalline silicon photovoltaic modules undergoing simultaneous thermal, mechanical, and humidity-freeze stress testing to develop a dark environmental chamber in-situ measurement procedure for determining module power loss. We analyze dark I-V curves measured...

  3. Effect of wet-chemical substrate pretreatment on electronic interface properties and recombination losses of a -Si:H/c -Si and a -SiN{sub x}:H/c -Si hetero-interfaces

    Energy Technology Data Exchange (ETDEWEB)

    Angermann, Heike; Conrad, Erhard; Korte, Lars; Schmidt, Manfred [Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Institut fuer Silizium-Photovoltaik, Berlin (Germany); Wuensch, Frank; Kunst, Marinus [Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Institut Solare Brennstoffe und Energiespeichermaterialien, Berlin (Germany); Laades, Abdelazize; Stuerzebecher, Uta [CiS Institut fuer Mikrosensorik GmbH, SolarZentrum Erfurt (Germany)

    2011-03-15

    Surface charge, surface state density and interface recombination behavior on polished float zone (FZ) solar cell substrates were investigated after various wet-chemical pre-cleaning procedures and deposition of amorphous silicon (a-Si:H) or silicon nitride (a-SiNx:H). Applying surface photo voltage (SPV), microwave detected photo conductance decay ({mu}W-PCD) and transient microwave conduction (TRMC) measurements, electronic interface properties were monitored repeatedly during the preparation processes. As shown for an inverted a-Si:H/c-Si hetero-junction structure, with front side passivation by a-SiN{sub x}:H and a p-type a-Si:H emitter on the rear side, the effect of optimised wet-chemical pre-treatment can be preserved during the subsequent soft plasma enhanced chemical vapour deposition of a-Si:H or a-SiN{sub x}:H. This leads to hetero-interfaces with low interface recombination velocities. These results were compared to previously reported findings, obtained on textured Czochralski (CZ) single crystalline substrates. a-SiN{sub x}:H is known to result in a field effect passivation. Nevertheless a strong influence of wet-chemical treatments on surface charge and recombination losses was observed on both flat and textured a-SiN{sub x}:H/c-Si interfaces. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  4. Atomic-Resolution Observations of Semi-Crystalline IntegranularThin Films in Silicon Nitride

    Energy Technology Data Exchange (ETDEWEB)

    Ziegler, Alexander; Idrobo, Juan C.; Cinibulk, Michael K.; Kisielowski, Christian; Browning, Nigel D.; Ritchie, Robert O.

    2005-08-01

    The thin intergranular phase in a silicon nitride (Si3N4)ceramic, which has been regarded for decades as having an entirely amorphous morphology, is shown to have a semi-crystalline structure. Using two different but complementary high-resolution electron microscopy methods, the intergranular atomic structure was directly imaged at the atomic level. These high-resolution images show that the atomic arrangement of the dopand element cerium takes very periodic positions not only along the interface between the intergranular phase and the Si3N4 matrix grains, but it arranges in a semi-crystalline structure that spans the entire width of the intergranular phase between two adjacent matrix grains, in principle connecting the two separate matrix grains. The result will have implications on the approach of understanding the materials properties of ceramics, most significantly on the mechanical properties and the associated computational modeling of the atomic structure of the thin intergranular phase in Si3N4 ceramics.

  5. Fabrication of amorphous micro-ring arrays in crystalline silicon using ultrashort laser pulses

    Science.gov (United States)

    Fuentes-Edfuf, Yasser; Garcia-Lechuga, Mario; Puerto, Daniel; Florian, Camilo; Garcia-Leis, Adianez; Sanchez-Cortes, Santiago; Solis, Javier; Siegel, Jan

    2017-05-01

    We demonstrate a simple way to fabricate amorphous micro-rings in crystalline silicon using direct laser writing. This method is based on the fact that the phase of a thin surface layer can be changed into the amorphous phase by irradiation with a few ultrashort laser pulses (800 nm wavelength and 100 fs duration). Surface-depressed amorphous rings with a central crystalline disk can be fabricated without the need for beam shaping, featuring attractive optical, topographical, and electrical properties. The underlying formation mechanism and phase change pathway have been investigated by means of fs-resolved microscopy, identifying fluence-dependent melting and solidification dynamics of the material as the responsible mechanism. We demonstrate that the lateral dimensions of the rings can be scaled and that the rings can be stitched together, forming extended arrays of structures not limited to annular shapes. This technique and the resulting structures may find applications in a variety of fields such as optics, nanoelectronics, and mechatronics.

  6. Study of the diffusion of points defects in crystalline silicon using the kinetic ART method

    Science.gov (United States)

    Trochet, Mickael; Brommer, Peter; Beland, Laurent-Karim; Joly, Jean-Francois; Mousseau, Normand

    2013-03-01

    Because of the long-time scale involved, the activated diffusion of point defects is often studied in standard molecular dynamics at high temperatures only, making it more difficult to characterize complex diffusion mechanisms. Here, we turn to the study of point defect diffusion in crystalline silicon using kinetic ART (kART), an off-lattice kinetic Monte Carlo method with on-the-fly catalog building based on the activation-relaxation technique (ART nouveau). By generating catalogs of diffusion mechanisms and fully incorporating elastic and off-lattice effects, kART is a unique tool for characterizing this problem. More precisely, using kART with the standard Stillinger-Weber potential we consider the evolution of crystalline cells with 1 to 4 vacancies and 1 to 4 interstitials at various temperatures and to provide a detailed picture of both the atomistic diffusion mechanisms and overall kinetics in addition to identifying special configurations such as a 2-interstitial super-diffuser.

  7. Diffusion of point defects in crystalline silicon using the kinetic activation-relaxation technique method

    Science.gov (United States)

    Trochet, Mickaël; Béland, Laurent Karim; Joly, Jean-François; Brommer, Peter; Mousseau, Normand

    2015-06-01

    We study point-defect diffusion in crystalline silicon using the kinetic activation-relaxation technique (k-ART), an off-lattice kinetic Monte Carlo method with on-the-fly catalog building capabilities based on the activation-relaxation technique (ART nouveau), coupled to the standard Stillinger-Weber potential. We focus more particularly on the evolution of crystalline cells with one to four vacancies and one to four interstitials in order to provide a detailed picture of both the atomistic diffusion mechanisms and overall kinetics. We show formation energies, activation barriers for the ground state of all eight systems, and migration barriers for those systems that diffuse. Additionally, we characterize diffusion paths and special configurations such as dumbbell complex, di-interstitial (IV-pair+2I) superdiffuser, tetrahedral vacancy complex, and more. This study points to an unsuspected dynamical richness even for this apparently simple system that can only be uncovered by exhaustive and systematic approaches such as the kinetic activation-relaxation technique.

  8. Combined Effect of Mechanical Grooving and Stain-Etched Surface on Optical and Electrical Properties of Crystalline Silicon Substrates

    Science.gov (United States)

    Zarroug, Ahmed; Derbali, Lotfi; Ouertani, Rachid; Dimassi, Wissem; Ezzaouia, Hatem

    2014-05-01

    This paper investigates the combined effect of mechanical grooving and porous silicon (PS) on the front surface reflectance and the electronic properties of crystalline silicon substrates. Mechanical surface texturization leads to reduce the cell reflectance, enhance the light trapping and augment the carrier collection probability. PS was introduced as an efficient antireflective coating (ARC) onto the front surface of crystalline silicon solar cell. Micro-periodic V-shaped grooves were made by means of a micro-groove machining process prior to junction formation. Subsequently, wafers were subjected to an isotropic potassium hydroxide (KOH) etching so that the V-shape would be turned to a U-shape. We found that the successive treatment of silicon surfaces with stain-etching, grooving then alkaline etching enhances the absorption of the textured surface, and decreases the reflectance from 35% to 7% in the 300-1200 nm wavelength range. We obtained a significant increase in the overall light path that generates the building up of the light trapping inside the substrate. We found an improvement in the illuminated I-V characteristics and an increase in the minority carrier lifetime τeff. Such a simple method was adopted to effectively reinforce the overall device performance of crystalline silicon-based solar cells.

  9. Study on the SiN_x/Al rear reflectance performance of crystalline silicon solar cells

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    The performance of internal rear surface reflectance of crystalline silicon solar cells is becoming more and more important with the decrease of thickness of the silicon wafers. In this paper PC1D was used to simulate the correlations between the rear surface reflectance and the electrical as well as optical properties of the solar cells. The results showed that the short circuit current, open circuit voltage and quantum efficiency were all enhanced with the increase of the rear reflectance. When the rear reflectance increased from 60% to 100%, the short circuit current, open circuit voltage and maximum output power were improved by about 0.128 A, 0.007 V, and 0.066 W, respectively. The internal quantum efficiency was improved by 39.9%, the external quantum increased by 17.4%, and the efficiency of the solar cells was enhanced by 0.4% at 1100 nm wavelength. The screen-printing was selected to prepare SiNx/Al reflector, and experimental results showed that the SiNx/Al reflector has desired characteristic of internal rear reflectance, with the reflectivity of 15% higher than that of conventional aluminum BSF at 1100 nm wavelength.

  10. The emergence of high-performance multi-crystalline silicon in photovoltaics

    Science.gov (United States)

    Lan, C. W.; Lan, A.; Yang, C. F.; Hsu, H. P.; Yang, M.; Yu, A.; Hsu, B.; Hsu, W. C.; Yang, A.

    2017-06-01

    The emergence of the high-performance multi-crystalline silicon (HP mc-Si) in 2011 has made a significant impact to photovoltaic industry. In addition to the much better ingot uniformity and production yield, HP mc-Si also has better material quality for solar cells. As a result, the average efficiency of solar cells made from HP mc-Si in production increased from 16.6% in 2011 to 18.5% or beyond in 2016. More importantly, the efficiency distribution became much narrower; the difference from various producers became smaller as well. Unlike the conventional way of having large grains and electrically-inactive twin boundaries, the crystal growth of HP mc-Si by directional solidification is initiated from uniform small grains having a high fraction of random grain boundaries. The grains developed from such grain structures significantly relax thermal stress and suppress the massive generation and propagation of dislocation clusters. The gettering efficacy of HP mc-Si is also superior to the conventional one. Nowadays, most of commercial mc-Si is grown by this approach, which could be implemented by either seeded with silicon particles or controlled nucleation, e.g., using nucleation agent coating. The future improvement of this technology will also be discussed in this review.

  11. Sprayed and Spin-Coated Multilayer Antireflection Coating Films for Nonvacuum Processed Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Abdullah Uzum

    2017-01-01

    Full Text Available Using the simple and cost-effective methods, spin-coated ZrO2-polymer composite/spray-deposited TiO2-compact multilayer antireflection coating film was introduced. With a single TiO2-compact film on the surface of a crystalline silicon wafer, 5.3% average reflectance (the reflectance average between the wavelengths of 300 nm and 1100 nm was observed. Reflectance decreased further down to 3.3% after forming spin-coated ZrO2 on the spray-deposited TiO2-compact film. Silicon solar cells were fabricated using CZ-Si p-type wafers in three sets: (1 without antireflection coating (ARC layer, (2 with TiO2-compact ARC film, and (3 with ZrO2-polymer composite/TiO2-compact multilayer ARC film. Conversion efficiency of the cells improved by a factor of 0.8% (from 15.19% to 15.88% owing to the multilayer ARC. Jsc was improved further by 2 mA cm−2 (from 35.3 mA cm−2 to 37.2 mA cm−2 when compared with a single TiO2-compact ARC.

  12. Band Offsets at the Interface between Crystalline and Amorphous Silicon from First Principles

    Science.gov (United States)

    Jarolimek, K.; Hazrati, E.; de Groot, R. A.; de Wijs, G. A.

    2017-07-01

    The band offsets between crystalline and hydrogenated amorphous silicon (a -Si ∶H ) are key parameters governing the charge transport in modern silicon heterojunction solar cells. They are an important input for macroscopic simulators that are used to further optimize the solar cell. Past experimental studies, using x-ray photoelectron spectroscopy (XPS) and capacitance-voltage measurements, have yielded conflicting results on the band offset. Here, we present a computational study on the band offsets. It is based on atomistic models and density-functional theory (DFT). The amorphous part of the interface is obtained by relatively long DFT first-principles molecular-dynamics runs at an elevated temperature on 30 statistically independent samples. In order to obtain a realistic conduction-band position the electronic structure of the interface is calculated with a hybrid functional. We find a slight asymmetry in the band offsets, where the offset in the valence band (0.29 eV) is larger than in the conduction band (0.17 eV). Our results are in agreement with the latest XPS measurements that report a valence-band offset of 0.3 eV [M. Liebhaber et al., Appl. Phys. Lett. 106, 031601 (2015), 10.1063/1.4906195].

  13. H2-Ar dilution for improved c-Si quantum dots in P-doped SiNx:H thin film matrix

    Science.gov (United States)

    Liu, Jia; Zhang, Weijia; Liu, Shengzhong (Frank)

    2017-02-01

    Phosphorus-doped hydrogenated silicon nitride (SiNx:H) thin films containing crystalline silicon quantum dot (c-Si QD) was prepared by plasma enhanced chemical vapor deposition (PECVD) using hydrogen-argon mixed dilution. The effects of H2/Ar flow ratio on the structural, electrical and optical characteristics of as-grown P-doped SiNx:H thin films were systematically investigated. Experimental results show that crystallization is promoted by increasing the H2/Ar flow ratio in dilution, while the N/Si atomic ratio is higher for thin film deposited with argon-rich dilution. As the H2/Ar flow ratio varies from 100/100 to 200/0, the samples exhibit excellent conductivity owing to the large volume fraction of c-Si QDs and effective P-doping. By adjusting the H2/Ar ratio to 100/100, P-doped SiNx:H thin film containing tiny and densely distributed c-Si QDs can be obtained. It simultaneously possesses wide optical band gap and high dark conductivity. Finally, detailed discussion has been made to analyze the influence of H2-Ar mixed dilution on the properties of P-doped SiNx:H thin films.

  14. Crystalline SiCO: Implication on structure and thermochemistry of ternary silicon oxycarbide ceramics

    Science.gov (United States)

    Bodiford, Nelli

    The need for innovative refractory materials---materials that can sustain extreme temperatures---has been constantly growing within the modern industries. Basic requirements for usage at ultra-high-temperatures have been considered such as high melting point, high structural strength, exceptional resistance to oxidation, zero or almost zero creep. Monolithic ceramics alone cannot provide these properties, therefore, composite materials are sought to fulfill the demand. For example, silicon nitride and silicon carbide based ceramics have long been leading contenders for structural use in gas turbine engines. In the course of this work we are investigating amorphous SiCO formed via polymer-to-ceramic route. Previously a considerable amount of work has been done on structures of stoichiometric amorphous SiCO and a "perfect" random network was obtained (experimentally as well as supported by computational work) up to the phase content of 33 mol-% SiC. By "perfect" one assumes to have four fold coordinated Si atoms bonded to C and O; C atoms bond to Si atoms only and O is two fold connected to Si. Beyond 33 mol-% SiC within SiCO phase the structural imperfections and defects start to develop. Aside from the stoichiometric form of SiCO, the polymer-to-ceramic route allows for the incorporation of high molar amounts of carbon to create SiCO ceramic with excess carbon. The incorporation of carbon into silica glass improves high-temperature mechanical properties and increases resistance to crystallization of the amorphous material. The amount of 'free carbon' can be controlled through the choice of precursors used during synthesis. There were no ternary crystalline phases of SiCO observed. However, in systems such as MgO-SiO2, Na2O-Al2O 3-SiO2 there are ternary crystalline compounds (MgSiO 3, Mg2SiO4, NaAlSiO4, NaAlSi3 O8) that are of a greater energetic stability than glasses of the same composition. What makes the SiCO system different? In the approach proposed in this

  15. Amorphous silicon oxide layers for surface passivation and contacting of heterostructure solar cells of amorphous and crystalline silicon; Amorphe Siliziumoxidschichten zur Oberflaechenpassivierung und Kontaktierung von Heterostruktur-Solarzellen aus amorphen und kristallinem Silizium

    Energy Technology Data Exchange (ETDEWEB)

    Einsele, Florian

    2010-02-05

    Atomic hydrogen plays a dominant role in the passivation of crystalline silicon surfaces by layers of amorphous silicon. In order to research into this role, this thesis presents the method of hydrogen effusion from thin amorphous films of silicon (a-Si:H) and silicon oxide (a-SiO{sub x}:H). The oxygen concentration of the sub-stoichiometric a-SiO{sub x}:H films ranges up to 10 at.-%. The effusion experiment yields information about the content and thermal stability of hydrogen and about the microstructure of the films. A mathematical description of the diffusion process of atomic hydrogen yields an analytical expression of the effusion rate R{sub E} depending on the linearly increasing temperature in the experiment. Fitting of the calculated effusion rates R{sub E} to measured effusion spectra yields the diffusion coefficient of atomic hydrogen in a-SiO{sub x}:H. With increasing oxygen concentration, the diffusion coefficient of hydrogen in the a-SiO{sub x}:H films decreases. This is attributed to an increasing Si-H bond energy due to back bonded oxygen, resulting in a higher stability of hydrogen in the films. This result is confirmed by an increasing thermal stability of the p-type c-Si passivation with a-SiO{sub x}:H of increasing oxygen concentrations up to 5 at.-%. The passivation reaches very low recombination velocities of S < 10 cm/s at the interface. However, for higher oxygen concentrations up to 10 at.-%, the passivation quality decreases significantly. Here, infrared spectroscopy of Si-H vibrational modes and hydrogen effusion show an increase of hydrogen-rich interconnected voids in the films. This microstructure results in a high amount of molecular hydrogen (H{sub 2}) in the layers, which is not suitable for the saturation of c-Si interface defects. Annealing of the films at temperatures around 400 C leads to a release of H{sub 2} from the voids, as a result of which Si-Si bonds in the material reconstruct. Subsequently, hydrogen migration in the

  16. Amorphous silicon oxide layers for surface passivation and contacting of heterostructure solar cells of amorphous and crystalline silicon; Amorphe Siliziumoxidschichten zur Oberflaechenpassivierung und Kontaktierung von Heterostruktur-Solarzellen aus amorphen und kristallinem Silizium

    Energy Technology Data Exchange (ETDEWEB)

    Einsele, Florian

    2010-02-05

    Atomic hydrogen plays a dominant role in the passivation of crystalline silicon surfaces by layers of amorphous silicon. In order to research into this role, this thesis presents the method of hydrogen effusion from thin amorphous films of silicon (a-Si:H) and silicon oxide (a-SiO{sub x}:H). The oxygen concentration of the sub-stoichiometric a-SiO{sub x}:H films ranges up to 10 at.-%. The effusion experiment yields information about the content and thermal stability of hydrogen and about the microstructure of the films. A mathematical description of the diffusion process of atomic hydrogen yields an analytical expression of the effusion rate R{sub E} depending on the linearly increasing temperature in the experiment. Fitting of the calculated effusion rates R{sub E} to measured effusion spectra yields the diffusion coefficient of atomic hydrogen in a-SiO{sub x}:H. With increasing oxygen concentration, the diffusion coefficient of hydrogen in the a-SiO{sub x}:H films decreases. This is attributed to an increasing Si-H bond energy due to back bonded oxygen, resulting in a higher stability of hydrogen in the films. This result is confirmed by an increasing thermal stability of the p-type c-Si passivation with a-SiO{sub x}:H of increasing oxygen concentrations up to 5 at.-%. The passivation reaches very low recombination velocities of S < 10 cm/s at the interface. However, for higher oxygen concentrations up to 10 at.-%, the passivation quality decreases significantly. Here, infrared spectroscopy of Si-H vibrational modes and hydrogen effusion show an increase of hydrogen-rich interconnected voids in the films. This microstructure results in a high amount of molecular hydrogen (H{sub 2}) in the layers, which is not suitable for the saturation of c-Si interface defects. Annealing of the films at temperatures around 400 C leads to a release of H{sub 2} from the voids, as a result of which Si-Si bonds in the material reconstruct. Subsequently, hydrogen migration in the

  17. The statistical shift of the chemical potential causing anomalous conductivity in hydrogenated microcrystalline silicon

    NARCIS (Netherlands)

    Lof, R.W.; Schropp, R.E.I.

    2010-01-01

    The behavior of the electrical conductivity in hydrogenated microcrystalline siliconc-Si:H) that is frequently observed is explained by considering the statistical shift in the chemical potential as a function of the crystalline fraction (Xc), the dangling bond density (N db), and the doping den

  18. Reaching Grid Parity Using BP Solar Crystalline Silicon Technology: A Systems Class Application

    Energy Technology Data Exchange (ETDEWEB)

    Cunningham, Daniel W; Wohlgemuth, John; Carlson, David E; Clark, Roger F; Gleaton, Mark; Posbic, John P; Zahler, James

    2010-12-06

    The primary target market for this program was the residential and commercial PV markets, drawing on BP Solar's premium product and service offerings, brand and marketing strength, and unique routes to market. These two markets were chosen because: (1) in 2005 they represented more than 50% of the overall US PV market; (2) they are the two markets that will likely meet grid parity first; and (3) they are the two market segments in which product development can lead to the added value necessary to generate market growth before reaching grid parity. Federal investment in this program resulted in substantial progress toward the DOE TPP target, providing significant advancements in the following areas: (1) Lower component costs particularly the modules and inverters. (2) Increased availability and lower cost of silicon feedstock. (3) Product specifically developed for residential and commercial applications. (4) Reducing the cost of installation through optimization of the products. (5) Increased value of electricity in mid-term to drive volume increases, via the green grid technology. (6) Large scale manufacture of PV products in the US, generating increased US employment in manufacturing and installation. To achieve these goals BP Solar assembled a team that included suppliers of critical materials, automated equipment developers/manufacturers, inverter and other BOS manufacturers, a utility company, and University research groups. The program addressed all aspects of the crystalline silicon PV business from raw materials (particularly silicon feedstock) through installation of the system on the customers site. By involving the material and equipment vendors, we ensured that supplies of silicon feedstock and other PV specific materials like encapsulation materials (EVA and cover glass) will be available in the quantities required to meet the DOE goals of 5 to 10 GW of installed US PV by 2015 and at the prices necessary for PV systems to reach grid parity in 2015

  19. Side chain engineering of poly-thiophene and its impact on crystalline silicon based hybrid solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Zellmeier, M.; Rappich, J.; Nickel, N. H. [Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Institute for Silicon Photovoltaics, Kekuléstr. 5, 12489 Berlin (Germany); Klaus, M.; Genzel, Ch. [Department of Microstructure and Residual Stress Analysis, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Albert-Einstein-Straße 15, 12489 Berlin (Germany); Janietz, S. [Department of Polymer Electronics, Fraunhofer Institute for Applied Polymer Research, Geiselbergstr. 69, 14476 Potsdam (Germany); Frisch, J.; Koch, N. [Humboldt Universität zu Berlin, Brook-Taylor-Straße 6, 12489 Berlin (Germany)

    2015-11-16

    The influence of ether groups in the side chain of spin coated regioregular polythiophene derivatives on the polymer layer formation and the hybrid solar cell properties was investigated using electrical, optical, and X-ray diffraction experiments. The polymer layers are of high crystallinity but the polymer with 3 ether groups in the side chain (P3TOT) did not show any vibrational fine structure in the UV-Vis spectrum. The presence of ether groups in the side chains leads to better adhesion resulting in thinner and more homogeneous polymer layers. This, in turn, enhances the electronic properties of the planar c-Si/poly-thiophene hybrid solar cell. We find that the power conversion efficiency increases with the number of ether groups in the side chains, and a maximum power conversion efficiency of η = 9.6% is achieved even in simple planar structures.

  20. High-temperature degradation in plasma-enhanced chemical vapor deposition Al{sub 2}O{sub 3} surface passivation layers on crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Kühnhold, Saskia [Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstraße 2, D-79110 Freiburg (Germany); Freiburg Materials Research Center FMF, Albert-Ludwigs-Universität Freiburg, Stefan-Meier-Straße 21 (Germany); Saint-Cast, Pierre; Kafle, Bishal; Hofmann, Marc [Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstraße 2, D-79110 Freiburg (Germany); Colonna, Francesco [Freiburg Materials Research Center FMF, Albert-Ludwigs-Universität Freiburg, Stefan-Meier-Straße 21 (Germany); Fraunhofer Institute for Mechanics of Materials IWM, Wöhlerstraße 11, 79108 Freiburg (Germany); Zacharias, Margit [Department of Microsystems Engineering IMTEK, Albert-Ludwigs-Universität Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg (Germany)

    2014-08-07

    In this publication, the activation and degradation of the passivation quality of plasma-enhanced chemical vapor deposited aluminum oxide (Al{sub 2}O{sub 3}) layers with different thicknesses (10 nm, 20 nm, and 110 nm) on crystalline silicon (c-Si) during long and high temperature treatments are investigated. As indicated by Fourier Transform Infrared Spectroscopy, the concentration of tetrahedral and octahedral sites within the Al{sub 2}O{sub 3} layer changes during temperature treatments and correlates with the amount of negative fixed charges at the Si/Al{sub 2}O{sub 3} interface, which was detected by Corona Oxide Characterization of Semiconductors. Furthermore, during a temperature treatment at 820 °C for 30 min, the initial amorphous Al{sub 2}O{sub 3} layer crystallize into the γ-Al{sub 2}O{sub 3} structure and was enhanced by additional oxygen as was proven by x-ray diffraction measurements and underlined by Density Functional Theory simulations. The crystallization correlates with the increase of the optical density up to 20% while the final Al{sub 2}O{sub 3} layer thickness decreases at the same time up to 26%. All observations described above were detected to be Al{sub 2}O{sub 3} layer thickness dependent. These observations reveal novel aspects to explain the temperature induced passivation and degradation mechanisms of Al{sub 2}O{sub 3} layers at a molecular level like the origin of the negative fixe charges at the Si/SiO{sub x}/Al{sub 2}O{sub 3} interface or the phenomena of blistering. Moreover, the crystal phase of Al{sub 2}O{sub 3} does not deliver good surface passivation due to a high concentration of octahedral sites leading to a lower concentration of negative fixed charges at the interface.

  1. Lattice location of implanted transition metals in 3C-SiC

    Science.gov (United States)

    Costa, A. R. G.; Wahl, U.; Correia, J. G.; Bosne, E.; Amorim, L. M.; Augustyns, V.; Silva, D. J.; da Silva, M. R.; Bharuth-Ram, K.; Pereira, L. M. C.

    2017-06-01

    We have investigated the lattice location of implanted transition metal (TM) 56Mn, 59Fe and 65Ni ions in undoped single-crystalline cubic 3C-SiC by means of the emission channeling technique using radioactive isotopes produced at the CERN-ISOLDE facility. We find that in the room temperature as-implanted state, most Mn, Fe and Ni atoms occupy carbon-coordinated tetrahedral interstitial sites (T C). Smaller TM fractions were also found on Si substitutional (S Si) sites. The TM atoms partially disappear from ideal-T C positions during annealing at temperatures between 500 °C and 700 °C, which is accompanied by an increase in the TM fraction occupying both S Si sites and random sites. An explanation is given according to what is known about the annealing mechanisms of silicon vacancies in silicon carbide. The origin of the observed lattice sites and their changes with thermal annealing are discussed and compared to the case of Si, highlighting the feature that the interstitial migration of TMs in SiC is much slower than in Si.

  2. High-rate deposition of nano-crystalline silicon thin films on plastics

    Energy Technology Data Exchange (ETDEWEB)

    Marins, E.; Guduru, V.; Cerqueira, F.; Alpuim, P. [Centro de Fisica, Universidade do Minho, 4800-058 Guimaraes, 4710-057 Braga (Portugal); Ribeiro, M. [Centro de Nanotecnologia e Materiais Tecnicos, Funcionais e Inteligentes (CeNTI), 4760-034 Vila Nova de Famalicao (Portugal); Bouattour, A. [Institut fuer Physikalische Elektronik (ipe), Universitaet Stuttgart, 70569 Stuttgart (Germany)

    2011-03-15

    Nanocrystalline silicon (nc-Si:H) is commonly used in the bottom cell of tandem solar cells. With an indirect bandgap, nc-Si:H requires thicker ({proportional_to}1 {mu}m) films for efficient light harvesting than amorphous Si (a-Si:H) does. Therefore, thin-film high deposition rates are crucial for further cost reduction of highly efficient a-Si:H based photovoltaic technology. Plastic substrates allow for further cost reduction by enabling roll-to-roll inline deposition. In this work, high nc-Si:H deposition rates on plastic were achieved at low substrate temperature (150 C) by standard Radio-frequency (13.56 MHz) Plasma Enhanced Chemical Vapor Deposition. Focus was on the influence of deposition pressure, inter-electrode distance (1.2 cm) and high power coupled to the plasma, on the hydrogen-to-silane dilution ratios (HD) necessary to achieve the amorphous-to-nanocrystalline phase transition and on the resulting film deposition rate. For each pressure and rf-power, there is a value of HD for which the films start to exhibit a certain amount of crystalline fraction. For constant rf-power, this value increases with pressure. Within the parameter range studied the deposition rate was highest (0.38 nm/s) for nc-Si:H films deposited at 6 Torr, 700 mW/cm{sup 2} using HD of 98.5%. Decreasing the pressure to 3 Torr (1.5 Torr) and rf-power to 350 mW/cm{sup 2} using HD - 98.5% deposition rate is 0.12 nm/s (0.076 nm/s). Raman crystalline fraction of these films is 72, 62 and 53% for the 6, 3 and 1.5 Torr films, respectively (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Crystalline silicon thin-film solar cells. Final report; Duennschicht-Solarzellen aus kristallinem Silizium. Abschlussbericht

    Energy Technology Data Exchange (ETDEWEB)

    Raeuber, A.; Wettling, W.; Eyer, A.; Faller, F.; Hebling, C.; Hurrle, A.; Lautenschlager, H.; Luedemann, R.; Lutz, F.; Reber, S.; Schetter, C.; Schillinger, N.; Schindler, R.; Schumacher, J.O.; Warta, W.

    1998-09-01

    Activities under the project covered all the processes involved in the fabrication of a crystalline silicon thin-film solar cell applying the high-temperature method, so that R and D work was carried out from testing of materials suitable for the dielectric and semiconductive layers required, development of the process sequences for fabrication of the solar cells, simulation and optimisation of the cell design through to final characterisation of the thin films and solar cells. Several cell designs were tested in parallel for intercomparison. Several high-temperature resistant materials were tested for their suitability to serve as substrate materials.The final project report presents the basic research work and studies on the physical and technological aspects of the crystalline thin-film solar cell as well as the major results of specific development work. The report shows that significant progress could be achieved. The efficiencies of all solar cell designs developed under the project are between 9 and 11%, including those using substrate materials easily available in industry, and it could be demonstrated that the solar cells are equal in potential to the wafer-based silicon cell. (orig./CB) [Deutsch] Es wurden alle wesentlichen Teilprozesse, die fuer die Entwicklung einer kristallinen Silicium Duennschicht-Solarzelle nach dem Hochtemperaturverfahren wichtig sind, bearbeitet. Der Projektrahmen reichte von der Materialentwicklung fuer die dielektrischen und halbleitenden Schichten ueber die Entwicklung der Solarzellenprozessschritte, die Simulation und Optimierung des Zellendesigns bis zur Charakterisierung von Schichten und Solarzellen. Dabei wurden mehrere verschiedene Zellentypen parallel untersucht und miteinander verglichen. In einer Studie wurden verschiedene hochtemperaturfeste Materialien auf ihre Eignung als Substrate hin untersucht. In dem hier vorgelegten Abschlussbericht werden die erarbeiteten Grundlagen zur Physik und Technologie der kristallinen

  4. Sheet resistance uniformity in drive-in step for different multi-crystalline silicon wafer dispositions

    Energy Technology Data Exchange (ETDEWEB)

    Moussi, A.; Bouhafs, D.; Mahiou, L. [Laboratoire des Cellules Photovoltaiques, Unite de Developpement de la Technologie du Silicium, 2 Bd, Frantz Fanon, B.P. 140, 7 Merveilles Alger (Algeria); Belkaid, M.S. [Dep. Electronique, Faculte de Genie Electrique et Informatique, UMMTO (Algeria)

    2009-09-15

    In this work, we present a study of emitters realized using different configurations of the silicon wafers in the quartz boat. The phosphorous liquid source is sprayed onto p-type multi-crystalline silicon substrates and the drive-in is made at high temperature in a muffle furnace. Three different configurations of the wafers in the boat are tested: separated, back to back and compact block of wafers. A fourth configuration is also used in source-receptor mode. The emitter phosphorous concentration profile is obtained by SIMS analysis. The resulting emitters are characterized by sheet resistance measurements and a comparison is made between the wafers within the same batch and from one batch to another. The uniformity and the standard deviation of the sheet resistance are calculated in each case. The emitter sheet resistance mapping of the wafer set in the middle of the boat for a given process gives a mean R{sub sq} 14.66 {omega}/sq with a standard deviation of 1.76% and uniformity of 18.7%. Standard deviations of 2.116% and 1.559% are obtained for wafers in the batch when using the spaced and compact configurations, respectively. The standard deviation is reduced to 0.68% when the wafers are used in source/receptor mode. A comparison is also made between wafers with different dilution of phosphorous source in ethanol. From these results we can conclude that the compact configuration offers better uniformity and lower standard deviation. Furthermore, when combined with the source-receptor configuration these parameters are significantly improved. This study allows the experimenter to identify the technological parameters of the solar cell emitter manufacturing and target precisely the desired values of the sheet resistance while limiting the number of rejected wafers. (author)

  5. Artificial neural systems using memristive synapses and nano-crystalline silicon thin-film transistors

    Science.gov (United States)

    Cantley, Kurtis D.

    Future computer systems will not rely solely on digital processing of inputs from well-defined data sets. They will also be required to perform various computational tasks using large sets of ill-defined information from the complex environment around them. The most efficient processor of this type of information known today is the human brain. Using a large number of primitive elements (˜1010 neurons in the neocortex) with high parallel connectivity (each neuron has ˜104 synapses), brains have the remarkable ability to recognize and classify patterns, predict outcomes, and learn from and adapt to incredibly diverse sets of problems. A reasonable goal in the push to increase processing power of electronic systems would thus be to implement artificial neural networks in hardware that are compatible with today's digital processors. This work focuses on the feasibility of utilizing non-crystalline silicon devices in neuromorphic electronics. Hydrogenated amorphous silicon (a-Si:H) nanowire transistors with Schottky barrier source/drain junctions, as well as a-Si:H/Ag resistive switches are fabricated and characterized. In the transistors, it is found that the on-current scales linearly with the effective width W eff of the channel nanowire array down to at least 20 nm. The solid-state electrolyte resistive switches (memristors) are shown to exhibit the proper current-voltage hysteresis. SPICE models of similar devices are subsequently developed to investigate their performance in neural circuits. The resulting SPICE simulations demonstrate spiking properties and synaptic learning rules that are incredibly similar to those in biology. Specifically, the neuron circuits can be designed to mimic the firing characteristics of real neurons, and Hebbian learning rules are investigated. Finally, some applications are presented, including associative learning analogous to the classical conditioning experiments originally performed by Pavlov, and frequency and pattern

  6. Advanced Front-Side Technology in Crystalline Silicon Solar Cells (Geavanceerde Frontend-Side Technolgy in kristallijn silicium zonnecellen)

    OpenAIRE

    2013-01-01

    The goal of this thesis is to improve the efficiency of silicon solar cells such that the cost/watt could be reduced to a competitive level. In this thesis, three aspects of the front-side of crystalline silicon solar cells have been investigated. Advanced texturing, emitter formation and passivation are detailed in chapters 2, 3 and 4 respectively. Below, each chapter is summarized. In chapter 2, a new technique has been developed that textures the frontside while polishing the rear-side. Th...

  7. Structural, electronic and transport properties of armorphous/crystalline silicon heterojunctions

    Energy Technology Data Exchange (ETDEWEB)

    Schulze, Tim Ferdinand

    2011-06-15

    The present dissertation is concerned with the physical aspects of the a-Si:H/c-Si heterojunction in the context of PV research. In a first step, the technological development which took place in the framework of the thesis is summarized. Its main constituent was the development and implementation of ultrathin ({<=}10 nm) undoped a-Si:H[(i)a-Si:H] layers to improve the passivation of the c-Si surface with the goal of increasing the open-circuit voltage of the solar cell. It is shown that the effect of (i)a-Si:H interlayers depends on the c-Si substrate doping type, and that challenges exist particularly on the technologically more relevant (n)c-Si substrate. A precise optimization of (i)a-Si:H thickness and the doping level of the following a-Si:H top layers is required to realize an efficiency gain in the solar cell. In this chapter, the key scientific questions to be tackled in the main part of the thesis are brought up by the technological development. In the next chapter, the charge carrier transport through a-Si:H/c-Si heterojunctions is investigated making use of current-voltage (I/V) characteristics taken at different temperatures. The dominant transport mechanisms in a-Si:H/c-Si heterojunctions are identified, and the relevance for solar cell operation is discussed. It is found that in the bias regime relevant for solar cell operation, the theoretical framework for the description of carrier transport in classical c-Si solar cells applies as well, which enables to use I/V curves for a simple characterization of a-Si:H/c-Si structures. The next chapter deals with the microscopic characterization of ultrathin a-Si:H layers. Employing infrared spectroscopy, spectroscopic ellipsometry, photoelectron spectroscopy and secondary ion mass spectroscopy, the structural, electronic and optical properties of (i)a-Si:H are analyzed. It is found that ultrathin a-Si:H essentially behaves like layers of 10..100 times the thickness. This represents the basis for the

  8. Impact of dopant concentrations on emitter formation with spin on dopant source in n-type crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Singha, Bandana; Solanki, Chetan Singh [Department of Energy Science and Technology, Indian Institute of Technology, Bombay Mumbai-400076, Maharashtra (India)

    2016-05-06

    Use of a suitable dopant source for emitter formation is an essential requirement in n-type crystalline silicon solar cells. Boron spin on dopant source, used as alternative to mostly used BBr{sub 3} liquid source, can yield an emitter with less diffusion induced defects under controlled conditions. Different concentrations of commercially available spin on dopant source is used and optimized in this work for sheet resistance values of the emitter ranging from 30 Ω/□ to 70 Ω/□ with emitter doping concentrations suitable for ohmic contacts. The dopant concentrations diluted with different ratios improves the carrier lifetime and thus improves the emitter performance. Hence use of suitable dopant source is essential in forming emitters in n-type crystalline silicon solar cells.

  9. Large-size, high-uniformity, random silver nanowire networks as transparent electrodes for crystalline silicon wafer solar cells.

    Science.gov (United States)

    Xie, Shouyi; Ouyang, Zi; Jia, Baohua; Gu, Min

    2013-05-06

    Metal nanowire networks are emerging as next generation transparent electrodes for photovoltaic devices. We demonstrate the application of random silver nanowire networks as the top electrode on crystalline silicon wafer solar cells. The dependence of transmittance and sheet resistance on the surface coverage is measured. Superior optical and electrical properties are observed due to the large-size, highly-uniform nature of these networks. When applying the nanowire networks on the solar cells with an optimized two-step annealing process, we achieved as large as 19% enhancement on the energy conversion efficiency. The detailed analysis reveals that the enhancement is mainly caused by the improved electrical properties of the solar cells due to the silver nanowire networks. Our result reveals that this technology is a promising alternative transparent electrode technology for crystalline silicon wafer solar cells.

  10. Evaluation of defects generation in crystalline silicon ingot grown by cast technique with seed crystal for solar cells.

    Science.gov (United States)

    Tachibana, Tomihisa; Sameshima, Takashi; Kojima, Takuto; Arafune, Koji; Kakimoto, Koichi; Miyamura, Yoshiji; Harada, Hirofumi; Sekiguchi, Takashi; Ohshita, Yoshio; Ogura, Atsushi

    2012-04-01

    Although crystalline silicon is widely used as substrate material for solar cell, many defects occur during crystal growth. In this study, the generation of crystalline defects in silicon substrates was evaluated. The distributions of small-angle grain boundaries were observed in substrates sliced parallel to the growth direction. Many precipitates consisting of light elemental impurities and small-angle grain boundaries were confirmed to propagate. The precipitates mainly consisted of Si, C, and N atoms. The small-angle grain boundaries were distributed after the precipitation density increased. Then, precipitates appeared at the small-angle grain boundaries. We consider that the origin of the small-angle grain boundaries was lattice mismatch and/or strain caused by the high-density precipitation.

  11. Camera-Based Lock-in and Heterodyne Carrierographic Photoluminescence Imaging of Crystalline Silicon Wafers

    Science.gov (United States)

    Sun, Q. M.; Melnikov, A.; Mandelis, A.

    2015-06-01

    Carrierographic (spectrally gated photoluminescence) imaging of a crystalline silicon wafer using an InGaAs camera and two spread super-bandgap illumination laser beams is introduced in both low-frequency lock-in and high-frequency heterodyne modes. Lock-in carrierographic images of the wafer up to 400 Hz modulation frequency are presented. To overcome the frame rate and exposure time limitations of the camera, a heterodyne method is employed for high-frequency carrierographic imaging which results in high-resolution near-subsurface information. The feasibility of the method is guaranteed by the typical superlinearity behavior of photoluminescence, which allows one to construct a slow enough beat frequency component from nonlinear mixing of two high frequencies. Intensity-scan measurements were carried out with a conventional single-element InGaAs detector photocarrier radiometry system, and the nonlinearity exponent of the wafer was found to be around 1.7. Heterodyne images of the wafer up to 4 kHz have been obtained and qualitatively analyzed. With the help of the complementary lock-in and heterodyne modes, camera-based carrierographic imaging in a wide frequency range has been realized for fundamental research and industrial applications toward in-line nondestructive testing of semiconductor materials and devices.

  12. Characterization of cell mismatch in a multi-crystalline silicon photovoltaic module

    Energy Technology Data Exchange (ETDEWEB)

    Crozier, J.L., E-mail: s207094248@live.nmmu.ac.za [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa); Dyk, E.E. van; Vorster, F.J. [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa)

    2012-05-15

    In this study the causes and effects of cell mismatch were identified in a multi-crystalline silicon photovoltaic module. Different techniques were used to identify the causes of the mismatch, including Electroluminescence (EL) imaging, Infrared (IR) imaging, current-voltage (I-V) characteristics, worst-case cell determination and Large Area Laser Beam Induced Current (LA-LBIC) scans. In EL images the cracked cells, broken fingers and material defects are visible. The presence of poorly contacted cells results in the formation of hot-spots. LA-LBIC line scans give the relative photoresponse of the cells in the module. However, this technique is limited due to the penetration depth of the laser beam. The worst case cell determination compares the I-V curves of the whole module with the I-V curve of the module with one cell covered, allowing the evaluation of the performance of each cell in a series-connected string. These methods allowed detection of the poorly performing cells in the module. Using all these techniques an overall view of the photoresponse in the cells and their performance is obtained.

  13. Numerical modelling on stress and dislocation generation in multi-crystalline silicon during directional solidification for PV applications

    Science.gov (United States)

    Srinivasan, M.; Karuppasamy, P.; Ramasamy, P.; Barua, A. K.

    2016-07-01

    Numerical modelling has emerged as a powerful tool for the development and optimization of directional solidification process for mass production of multicrystalline silicon. A transient global heat transfer model is performed to investigate the effect of bottom grooved furnace upon the directional solidification (DS) process of multi-crystalline silicon (mc-Si). The temperature distribution, von Mises stress, residual stress and dislocation density rate in multi-crystalline silicon ingots grown by modified directional solidification method have been investigated for five growth stages using finite volume method at the critical Prandtl number, Pr = 0.01. This paper discusses bottom groove furnace instead of seed crystal DS method. It achieves an advanced understanding of the thermal and mechanical behaviour in grown multi-crystalline ingot by bottom grooved directional solidification method. The von Mises stress and dislocation density were reduced while using the bottom grooved furnace. This work was carried out in the different grooves of radius 30 mm, 60 mm and 90 mm of the heat exchanger block of the DS furnace. In this paper, the results are presented for 60 mm radius groove only because it has got better results compared to the other grooves. Also, the computational results of bottom grooved DS method show better performance compared the conventional DS method for stress and dislocation density in grown ingot. [Figure not available: see fulltext.

  14. Silicon nitride equation of state

    Science.gov (United States)

    Brown, Robert C.; Swaminathan, Pazhayannur K.

    2017-01-01

    This report presents the development of a global, multi-phase equation of state (EOS) for the ceramic silicon nitride (Si3N4).1 Structural forms include amorphous silicon nitride normally used as a thin film and three crystalline polymorphs. Crystalline phases include hexagonal α-Si3N4, hexagonal β-Si3N4, and the cubic spinel c-Si3N4. Decomposition at about 1900 °C results in a liquid silicon phase and gas phase products such as molecular nitrogen, atomic nitrogen, and atomic silicon. The silicon nitride EOS was developed using EOSPro which is a new and extended version of the PANDA II code. Both codes are valuable tools and have been used successfully for a variety of material classes. Both PANDA II and EOSPro can generate a tabular EOS that can be used in conjunction with hydrocodes. The paper describes the development efforts for the component solid phases and presents results obtained using the EOSPro phase transition model to investigate the solid-solid phase transitions in relation to the available shock data that have indicated a complex and slow time dependent phase change to the c-Si3N4 phase. Furthermore, the EOSPro mixture model is used to develop a model for the decomposition products; however, the need for a kinetic approach is suggested to combine with the single component solid models to simulate and further investigate the global phase coexistences.

  15. Key Success Factors and Future Perspective of Silicon-Based Solar Cells

    Directory of Open Access Journals (Sweden)

    S. Binetti

    2013-01-01

    Full Text Available Today, after more than 70 years of continued progress on silicon technology, about 85% of cumulative installed photovolatic (PV modules are based on crystalline silicon (c-Si. PV devices based on silicon are the most common solar cells currently being produced, and it is mainly due to silicon technology that the PV has grown by 40% per year over the last decade. An additional step in the silicon solar cell development is ongoing, and it is related to a further efficiency improvement through defect control, device optimization, surface modification, and nanotechnology approaches. This paper attempts to briefly review the most important advances and current technologies used to produce crystalline silicon solar devices and in the meantime the most challenging and promising strategies acting to increase the efficiency to cost/ratio of silicon solar cells. Eventually, the impact and the potentiality of using a nanotechnology approach in a silicon-based solar cell are also described.

  16. Evaluation of CVI SiC/SiC Composites for High Temperature Applications

    Science.gov (United States)

    Kiser, D.; Almansour, A.; Smith, C.; Gorican, D.; Phillips, R.; Bhatt, R.; McCue, T.

    2017-01-01

    Silicon carbide fiber reinforced silicon carbide (SiC/SiC) composites are candidate materials for various high temperature turbine engine applications because of their high specific strength and good creep resistance at temperatures of 1400 C (2552 F) and higher. Chemical vapor infiltration (CVI) SiC/SiC ceramic matrix composites (CMC) incorporating Sylramic-iBN SiC fiber were evaluated via fast fracture tensile tests (acoustic emission damage characterization to assess cracking behavior), tensile creep testing, and microscopy. The results of this testing and observed material behavior degradation mechanisms are reviewed.

  17. Plasmonic nanomesh sandwiches for ultrathin film silicon solar cells

    Science.gov (United States)

    Gao, Tongchuan; Wang, Baomin; Leu, Paul W.

    2017-02-01

    We theoretically investigate the strategy of integrating metal nanoparticles (NPs)/nanomeshes (NMs) into the top and/or bottom of crystalline silicon (c-Si) thin film solar cells for light trapping and enhanced carrier collection. C-Si thin films exhibit absorption resonances corresponding to Fabry-Pérot modes. Frontside metal NPs enhance absorption by additionally coupling light into localized surface plasmon resonances and c-Si waveguide modes, while a frontside metal NM increases absorption by coupling light into surface plasmon polaritons and c-Si waveguide modes. The frontside metal NM also functions as a flexible top electrode, which may replace conventional brittle transparent conductive oxide thin films. The backside metal NM exhibits enhanced absorption due to the coupling of light into c-Si waveguide modes and the cavity modes within the holes of metal NM. We illustrate how the optimal metal NM sandwich, consisting of NMs on both sides of a 300 nm thick c-Si with an appropriate antireflection coating (ARC), achieves a 72.9% enhancement in short-circuit current density compared with that of a 300 nm thick c-Si thin film solar cell with 100 nm thick Si3N4 ARC and 300 nm thick Ag back reflector. The current generation in the metal NM sandwich is more in the center of the thin film such that there should be less surface recombination. The uniform current generation throughout the film results in less overall recombination.

  18. Carbonization and transition layer effects on 3C-SiC film residual stress

    Science.gov (United States)

    Anzalone, R.; Litrico, G.; Piluso, N.; Reitano, R.; Alberti, A.; Fiorenza, P.; Coffa, S.; La Via, F.

    2017-09-01

    In this work an extended study of the carbonization process of the silicon surface and of a low temperature transition layer in the temperature rump on the 3C-SiC epitaxial growth has been reported. It has been observed that increasing the C/H2 ratio the voids density decreases, the thickness of the carbonization layer and the density increase and the morphology improves. The low temperature transition layer, grown during the ramp between the carbonization step and the real growth process, produce a further reduction of the voids at the 3C-SiC/Si interface and a considerable reduction of the stress of the 3C-SiC film. This stress reduction is related to a large change of the film morphology. No effect of the interface silicon layer on the stress is observed. This study has shown the complex connection between the first steps of the 3C-SiC growth process and the properties of the film in term of stress and superficial morphology. The residual stress has important implications with regard to the processing (wafer bow) and quality of the epitaxy. Residual stress also changes the mechanical response and/or the resonant frequency of the thin-film structure and may degrade the performance in MEMS-based devices. Therefore, a better understanding of the stress relaxation mechanism could improve the performances of 3C-SiC devices and sensor technologies.

  19. Performance improvement of n-i-p μc-Si:H solar cells by gradient hydrogen dilution technique

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    High pressure radio frequency plasma enhanced chemical vapor deposition(RF-PECVD)process was adopted to investigate the effect of constant hydrogen dilution technique and gradient hydrogen dilu-tion technique on the structural evolution of intrinsic films and the performance of n-i-p microcrystal-line silicon solar cells.The experiment results demonstrated that the grain size and crystalline volume fraction along the growth direction of intrinsic films can be controlled and the performance of solar cells can be greatly improved by gradient hydrogen dilution technique.An initial active-area efficiency of 5.7%(Voc=0.47V,Jsc=20.2mA/cm2,FF=60%)for the μc-Si:H single-junction n-i-p solar cells and an initial active-area efficiency of 10.12%(Voc=1.2V,Jsc=12.05mA/cm2,FF=70%)for the a-Si:H/μc-Si:H tandem n-i-p solar cells has been achieved.

  20. Femtosecond laser-controlled self-assembly of amorphous-crystalline nanogratings in silicon

    Science.gov (United States)

    Puerto, Daniel; Garcia-Lechuga, Mario; Hernandez-Rueda, Javier; Garcia-Leis, Adianez; Sanchez-Cortes, Santiago; Solis, Javier; Siegel, Jan

    2016-07-01

    Self-assembly (SA) of molecular units to form regular, periodic extended structures is a powerful bottom-up technique for nanopatterning, inspired by nature. SA can be triggered in all classes of solid materials, for instance, by femtosecond laser pulses leading to the formation of laser-induced periodic surface structures (LIPSS) with a period slightly shorter than the laser wavelength. This approach, though, typically involves considerable material ablation, which leads to an unwanted increase of the surface roughness. We present a new strategy to fabricate high-precision nanograting structures in silicon, consisting of alternating amorphous and crystalline lines, with almost no material removal. The strategy can be applied to static irradiation experiments and can be extended into one and two dimensions by scanning the laser beam over the sample surface. We demonstrate that lines and areas with parallel nanofringe patterns can be written by an adequate choice of spot size, repetition rate and scan velocity, keeping a constant effective pulse number (N eff) per area for a given laser wavelength. A deviation from this pulse number leads either to inhomogeneous or ablative structures. Furthermore, we demonstrate that this approach can be used with different laser systems having widely different wavelengths (1030 nm, 800 nm, 400 nm), pulse durations (370 fs, 100 fs) and repetition rates (500 kHz, 100 Hz, single pulse) and that the grating period can also be tuned by changing the angle of laser beam incidence. The grating structures can be erased by irradiation with a single nanosecond laser pulse, triggering recrystallization of the amorphous stripes. Given the large differences in electrical conductivity between the two phases, our structures could find new applications in nanoelectronics.

  1. The effect of metallic coatings and crystallinity on the volume expansion of silicon during electrochemical lithiation/delithiation

    KAUST Repository

    McDowell, Matthew T.

    2012-05-01

    Applying surface coatings to alloying anodes for Li-ion batteries can improve rate capability and cycle life, but it is unclear how this second phase affects mechanical deformation during electrochemical reaction. Here, in-situ transmission electron microscopy is employed to investigate the electrochemical lithiation and delithiation of silicon nanowires (NWs) with copper coatings. When copper is coated on only one sidewall, the NW bilayer structure bends during delithiation due to length changes in the silicon. Tensile hoop stress causes conformal copper coatings to fracture during lithiation without undergoing bending deformation. In addition, in-situ and ex-situ observations indicate that a copper coating plays a role in suppressing volume expansion during lithiation. Finally, the deformation characteristics and dimensional changes of amorphous, polycrystalline, and single-crystalline silicon are compared and related to observed electrochemical behavior. This study reveals important aspects of the deformation process of silicon anodes, and the results suggest that metallic coatings can be used to improve rate behavior and to manage or direct volume expansion in optimized silicon anode frameworks. © 2012 Elsevier Ltd.

  2. Theoretical study of sorption and diffusion of lithium atoms on the surface of crystalline silicon and inside it

    Science.gov (United States)

    Kuzubov, A. A.; Eliseeva, N. S.; Popov, Z. I.; Fedorov, A. S.; Serzhantova, M. V.; Denisov, V. M.; Tomilin, F. N.

    2013-08-01

    The energy of the sorption and diffusion of lithium atoms on the reconstructed (4 × 2) (100) silicon surface in the process of their transport into near-surface layers, as well as inside crystalline silicon, at various lithium concentrations have been investigated within the density functional theory. It has been shown that single lithium atoms easily migrate on the (100) surface and gradually fill the surface states (T3 and L) located in channels between silicon dimers. The diffusion of lithium into near-surface silicon layers is hampered because of high potential barriers of the transition (1.22 eV). The dependences of the binding energy, potential barriers, and diffusion coefficient inside silicon on distances to the nearest lithium atoms have also been examined. It has been shown that an increase in the concentration of lithium to the Li0.5Si composition significantly reduces the transition energy (from 0.90 to 0.36 eV) and strongly increases (by one to three orders of magnitude) the lithium diffusion rate.

  3. Improvement of the Crystallinity of Silicon Films Deposited by Hot-Wire Chemical Vapor Deposition with Negative Substrate Bias

    Science.gov (United States)

    Zhang, Lei; Shen, Honglie; You, Jiayi

    2013-08-01

    We have investigated the effect of negative substrate bias on microcrystalline silicon films deposited on glass and stainless steel by hot-wire chemical vapor deposition (HWCVD) to gain insight into the effect of negative substrate bias on crystallization. Structural characterization of the silicon films was performed by Raman spectroscopy, x-ray diffraction, and scanning electron microscopy. It was found that the crystallinity of the films is obviously improved by applying the substrate bias, especially for films on stainless steel. At hot-wire temperature of 1800°C and negative substrate bias of -800 V, grain size as large as 200 nm was obtained on stainless-steel substrate with crystalline fraction 9% higher than that of films deposited on glass and 15% higher than that of films deposited without substrate bias. It is deduced that the improvement of the crystallinity is mainly related to the accelerated electrons emitted from the hot wires. The differences in this improvement between different substrates are caused by the different electrical potential of the substrates. A solar cell fabricated by HWCVD with -800 V substrate bias is demonstrated, showing an obviously higher conversion efficiency than that without substrate bias.

  4. Advanced Environmental Barrier Coatings Developed for SiC/SiC Composite Vanes

    Science.gov (United States)

    Lee, Kang N.; Fox, Dennis S.; Eldridge, Jeffrey I.; Zhu, Dongming; Bansal, Narottam P.; Miller, Robert A.

    2003-01-01

    Ceramic components exhibit superior high-temperature strength and durability over conventional component materials in use today, signifying the potential to revolutionize gas turbine engine component technology. Silicon-carbide fiber-reinforced silicon carbide ceramic matrix composites (SiC/SiC CMCs) are prime candidates for the ceramic hotsection components of next-generation gas turbine engines. A key barrier to the realization of SiC/SiC CMC hot-section components is the environmental degradation of SiC/SiC CMCs in combustion environments. This is in the form of surface recession due to the volatilization of silica scale by water vapor. An external environmental barrier coating (EBC) is a logical approach to achieve protection and long-term durability.

  5. Optical Properties of Spin-Coated TiO2 Antireflection Films on Textured Single-Crystalline Silicon Substrates

    Directory of Open Access Journals (Sweden)

    Ryosuke Watanabe

    2015-01-01

    Full Text Available Antireflection coating (ARC prepared by a wet process is beneficial for low cost fabrication of photovoltaic cells. In this study, we investigated optical properties and morphologies of spin-coated TiO2 ARCs on alkaline textured single-crystalline silicon wafers. Reflectance spectra of the spin-coated ARCs on alkaline textured silicon wafers exhibit no interferences and low reflectance values in the entire visible range. We modeled the structures of the spin-coated films for ray tracing numerical calculation and compared numerically calculated reflectance spectra with the experimental results. This is the first report to clarify the novel optical properties experimentally and theoretically. Optical properties of the spin-coated ARCs without interference are due to the fractional nonuniformity of the thickness of the spin-coated ARCs that cancels out the interference of the incident light.

  6. In-Situ Measurement of Power Loss for Crystalline Silicon Modules Undergoing Thermal Cycling and Mechanical Loading Stress Testing

    DEFF Research Database (Denmark)

    Spataru, Sergiu; Hacke, Peter; Sera, Dezso

    We analyze the degradation of multi-crystalline silicon photovoltaic modules undergoing simultaneous thermal, mechanical, and humidity-freeze stress testing to develop a dark environmental chamber in-situ measurement procedure for determining module power loss. We analyze dark I-V curves measured...... due to cell fractures, and the additional series resistance losses observed under illumination. Based on the analysis, we propose an in-situ module power loss monitoring procedure that relies on dark current-voltage measurements taken during the stress test and initial and final module flash testing...

  7. Operando XPS Characterization of Selective Contacts: The Case of Molybdenum Oxide for Crystalline Silicon Heterojunction Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Ding, Laura; Harvey, Stephen P.; Teeter, Glenn; Bertoni, Mariana I.

    2016-11-21

    We demonstrate the potential of X-ray photoelectron spectroscopy (XPS) to characterize new carrier-selective contacts (CSC) for solar cell application. We show that XPS not only provides information about the surface chemical properties of the CSC material, but that operando XPS, i.e. under light bias condition, can also directly measure the photovoltage that develops at the CSC/absorber interface, revealing device relevant information without the need of assembling a full solar cell. We present the application of the technique to molybdenum oxide hole-selective contact films on a crystalline silicon absorber.

  8. Channeling and Radiation of Electrons in Silicon Single Crystals and Si1−xGex Crystalline Undulators

    DEFF Research Database (Denmark)

    Backe, H.; Krambrich, D.; Lauth, W.

    2013-01-01

    potential of the silicon single crystals. Radiation from a crystalline undulator, produced at the Aarhus University (UAAR), has been investigated at the Mainz Microtron electron accelerator facility MAMI. The 4-period epitaxially grown strained layer Si1−xGex undulator had a period length λu = 9.9 μm....... At a beam energy of 375 MeV a broad excess yield around the theoretically expected photon energy of 0.132 MeV has been observed. Model calculations on the basis of synchrotron-like radiation emission suggest that evidence for a weak undulator effect has been observed....

  9. Analysis of temperature and impurity distributions in a unidirectional-solidification process for multi-crystalline silicon of solar cells by a global model

    Energy Technology Data Exchange (ETDEWEB)

    Kakimoto, Koichi [Research Institute for Applied Mechanics, Kyushu University, 6-1, Kasuga-Koen, Kasuga 816-8580 (Japan)]. E-mail: kakimoto@riam.kyushu-u.ac.jp; Liu Lijun [Research Institute for Applied Mechanics, Kyushu University, 6-1, Kasuga-Koen, Kasuga 816-8580 (Japan); Nakano, Satoshi [Research Institute for Applied Mechanics, Kyushu University, 6-1, Kasuga-Koen, Kasuga 816-8580 (Japan)

    2006-10-15

    The unidirectional-solidification process is a key method for large-scale production of multi-crystalline silicon for use in highly efficient solar cells in the photovoltaic industry. Since the efficiency of solar cells depends on the crystal quality of the multi-crystalline silicon, it is necessary to optimize the unidirectional-solidification process to control temperature and impurity distributions in a silicon ingot. We developed a transient global model for the unidirectional-solidification process. We carried out calculations to investigate the temperature and impurity distributions in a silicon ingot during solidification. Conductive heat transfer and radiative heat exchange in a unidirectional-solidification furnace and convective heat transfer in the melt in a crucible are coupled to each other. These heat exchanges were solved iteratively by a finite volume method in a transient condition. Time-dependent distributions of impurity and temperature in a silicon ingot during the unidirectional-solidification process were numerically investigated.

  10. Crystalline Silicon Interconnected Strips (XIS). Introduction to a New, Integrated Device and Module Concept

    Energy Technology Data Exchange (ETDEWEB)

    Van Roosmalen, J.; Bronsveld, P.; Mewe, A.; Janssen, G.; Stodolny, M.; Cobussen-Pool, E.; Bennett, I.; Weeber, A.; Geerligs, B. [ECN Solar Energy, P.O. Box 1, NL-1755 ZG, Petten (Netherlands)

    2012-06-15

    A new device concept for high efficiency, low cost, wafer based silicon solar cells is introduced. To significantly lower the costs of Si photovoltaics, high efficiencies and large reductions of metals and silicon costs are required. To enable this, the device architecture was adapted into low current devices by applying thin silicon strips, to which a special high efficiency back-contact heterojunction cell design was applied. Standard industrial production processes can be used for our fully integrated cell and module design, with a cost reduction potential below 0.5 euro/Wp. First devices have been realized demonstrating the principle of a series connected back contact hybrid silicon heterojunction module concept.

  11. Growth of 3C-SiC on 150-mm Si(100) substrates by alternating supply epitaxy at 1000 deg. C

    Energy Technology Data Exchange (ETDEWEB)

    Wang Li, E-mail: l.wang@griffith.edu.au; Dimitrijev, Sima; Han, Jisheng; Iacopi, Alan; Hold, Leonie; Tanner, Philip; Harrison, H. Barry

    2011-07-29

    To lower deposition temperature and reduce thermal mismatch induced stress, heteroepitaxial growth of single-crystalline 3C-SiC on 150 mm Si wafers was investigated at 1000 deg. C using alternating supply epitaxy. The growth was performed in a hot-wall low-pressure chemical vapor deposition reactor, with silane and acetylene being employed as precursors. To avoid contamination of Si substrate, the reactor was filled in with oxygen to grow silicon dioxide, and then this thin oxide layer was etched away by silane, followed by a carbonization step performed at 750 deg. C before the temperature was ramped up to 1000 deg. C to start the growth of SiC. Microstructure analyses demonstrated that single-crystalline 3C-SiC is epitaxially grown on Si substrate and the film quality is improved as thickness increases. The growth rate varied from 0.44 to 0.76 {+-} 0.02 nm/cycle by adjusting the supply volume of SiH{sub 4} and C{sub 2}H{sub 2}. The thickness nonuniformity across wafer was controlled with {+-} 1%. For a prime grade 150 mm virgin Si(100) wafer, the bow increased from 2.1 to 3.1 {mu}m after 960 nm SiC film was deposited. The SiC films are naturally n type conductivity as characterized by the hot-probe technique.

  12. Thermo-Oxidative Degradation Of SiC/Si3N4 Composites

    Science.gov (United States)

    Baaklini, George Y.; Batt, Ramakrishna T.; Rokhlin, Stanislav I.

    1995-01-01

    Experimental study conducted on thermo-oxidative degradation of composite-material specimens made of silicon carbide fibers in matrices of reaction-bonded silicon nitride. In SiC/Si3N4 composites of study, interphase is 3-micrometers-thick carbon-rich coat on surface of each SiC fiber. Thermo-oxidative degradation of these composites involves diffusion of oxygen through pores of composites to interphases damaged by oxidation. Nondestructive tests reveal critical exposure times.

  13. Application of C/SiC Composites in Space Optical System Abroad%C/SiC材料在国外空间光学系统上的应用

    Institute of Scientific and Technical Information of China (English)

    朱晓娟; 夏英伟

    2013-01-01

    Carbon fiber reinforced silicon carbide ceramic matrix composites (C/SiC) is a material that possess high specific stiffness,low sensitivity of thermal distortion and the adaptability in high and cryogenic temperatures,which make it a most promising space optical application material.The article summarizes the fabrication processes of C/SiC and the practical application of C/SiC to space technologies abroad.%C/SiC复合材料具有高的比强度、低的热变形敏感度以及在高低温环境下的适应性,这使其成为目前最具前途的空间光学系统应用材料.本文总结了国外一些国家C/SiC的制备方法及其在空间技术上的具体应用.

  14. Doping and stability of 3C-SiC: from thinfilm to bulk growth

    DEFF Research Database (Denmark)

    Jokubavicius, V.; Sun, J.; Linnarsson, M. K.

    Cubic silicon carbide (3C-SiC) could pave the way for development of advanced electronic and optoelectronic devices. It could be an excellent substrate for growth of nitride and epitaxial graphene layers. Boron doped 3C-SiC films could reach up to 60% efficiency and pave the way for a new solar...... cell technology. Nitrogen and boron doped 3C-SiC layers can depict a new infrared LED. Hexagonal SiC is an excellent substrate for heteropeitaxial growth of 3C-SiC due to excellent compatibility in lattice constant and thermal expansion coefficient. However, the growth of 3C-SiC on such substrates...... is still being followed by a number of obstacles like polytype stabilization and high density of double positioning boundaries in the grown material. The polytype stability during epitaxial growth of doped 3C-SiC has not been explored. Consequently, the polytype stability during bulk growth of doped 3C...

  15. Si-C Linked Organic Monolayers on Crystalline Silicon Surfaces as Alternative Gate Insulators

    NARCIS (Netherlands)

    Faber, Erik J.; Smet, de Louis C.P.M.; Olthuis, Wouter; Zuilhof, Han; Sudhölter, Ernst J.R.; Bergveld, Piet; Berg, van den Albert

    2005-01-01

    Herein, the influence of silicon surface modification via Si-CnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type (100) and n-type (100) silicon is studied by forming MIS (metal–insulator–semiconductor) diodes using a mercury probe. From current density–voltage (J–V) and capacitance–voltage (C–

  16. Femtosecond laser direct hard mask writing for selective facile micron-scale inverted-pyramid patterning of silicon

    Science.gov (United States)

    Kumar, K.; Lee, K. K. C.; Herman, P. R.; Nogami, J.; Kherani, N. P.

    2012-11-01

    We report on the fabrication of high-fidelity inverted-pyramids in crystalline silicon (c-Si) at the 1 μm scale through the selective removal of a silicon nitride (SiNx) hard-mask with a 522 nm femtosecond (fs) laser and subsequent alkaline potassium hydroxide (KOH) etching. Through a series of systematic experiments on a range of hard-mask thicknesses, the use of 20 nm thick SiNx film yielded a 0.6 μm diameter laser-ejected aperture in the hard-mask at a single pulse fluence of 0.45 J cm-2, resulting in 1 μm wide inverted-pyramid structure in c-Si after KOH etching. Anisotropic KOH etching of the partially amorphized c-Si underlying the fs-laser patterned hard mask was found to render clean (111) planes of c-Si. An array of inverted-pyramids on c-Si surfaces as large as 4 cm2 was produced with a defect density of less than 1 in 104. This facile, non-contact, and cleanroom-independent technique serves a variety of applications including anti-reflective texturing of thin c-Si for photovoltaics, wafer marking, labeling, and fabrication of microfluidic and optical devices or laboratories on silicon wafers.

  17. Optoelectronic properties of Black-Silicon generated through inductively coupled plasma (ICP) processing for crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Hirsch, Jens, E-mail: J.Hirsch@emw.hs-anhalt.de [Anhalt University of Applied Sciences, Faculty EMW, Bernburger Str. 55, DE-06366 Köthen (Germany); Fraunhofer Center for Silicon Photovoltaics CSP, Otto-Eißfeldt-Str. 12, DE-06120 Halle (Saale) (Germany); Gaudig, Maria; Bernhard, Norbert [Anhalt University of Applied Sciences, Faculty EMW, Bernburger Str. 55, DE-06366 Köthen (Germany); Lausch, Dominik [Fraunhofer Center for Silicon Photovoltaics CSP, Otto-Eißfeldt-Str. 12, DE-06120 Halle (Saale) (Germany)

    2016-06-30

    Highlights: • Fabrication of black silicon through inductively coupled plasma (ICP) processing. • Suppressed formation a self-bias and therefore a reduced ion bombardment of the silicon sample. • Reduction of the average hemispherical reflection between 300 and 1120 nm up to 8% within 5 min ICP process time. • Reflection is almost independent of the angle of incidence up to 60°. • 2.5 ms effective lifetime at 10{sup 15} cm{sup −3} MCD after ALD Al{sub 2}O{sub 3} surface passivation. - Abstract: The optoelectronic properties of maskless inductively coupled plasma (ICP) generated black silicon through SF{sub 6} and O{sub 2} are analyzed by using reflection measurements, scanning electron microscopy (SEM) and quasi steady state photoconductivity (QSSPC). The results are discussed and compared to capacitively coupled plasma (CCP) and industrial standard wet chemical textures. The ICP process forms parabolic like surface structures in a scale of 500 nm. This surface structure reduces the average hemispherical reflection between 300 and 1120 nm up to 8%. Additionally, the ICP texture shows a weak increase of the hemispherical reflection under tilted angles of incidence up to 60°. Furthermore, we report that the ICP process is independent of the crystal orientation and the surface roughness. This allows the texturing of monocrystalline, multicrystalline and kerf-less wafers using the same parameter set. The ICP generation of black silicon does not apply a self-bias on the silicon sample. Therefore, the silicon sample is exposed to a reduced ion bombardment, which reduces the plasma induced surface damage. This leads to an enhancement of the effective charge carrier lifetime up to 2.5 ms at 10{sup 15} cm{sup −3} minority carrier density (MCD) after an atomic layer deposition (ALD) with Al{sub 2}O{sub 3}. Since excellent etch results were obtained already after 4 min process time, we conclude that the ICP generation of black silicon is a promising technique

  18. SiC-SiC and C-SiC Honeycomb for Advanced Flight Structures Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The proposed project builds upon the work done in Phase I with the development of a C-SiC CMC honeycomb material that was successfully tested for mechanical...

  19. Comparative study of the reliability of MPPT algorithms for the crystalline silicon photovoltaic modules in variable weather conditions

    Directory of Open Access Journals (Sweden)

    Abraham Dandoussou

    2017-05-01

    Full Text Available The crystalline silicon photovoltaic modules are widely used as power supply sources in the tropical areas where the weather conditions change abruptly. Fortunately, many MPPT algorithms are implemented to improve their performance. In the other hand, it is well known that these power supply sources are nonlinear dipoles and so, their intrinsic parameters may vary with the irradiance and the temperature. In this paper, the MPPT algorithms widely used, i.e. Perturb and Observe (P&O, Incremental Conductance (INC, Hill-Climbing (HC, are implemented using Matlab®/Simulink® model of a crystalline silicon photovoltaic module whose intrinsic parameters were extracted by fitting the I(V characteristic to experimental points. Comparing the simulation results, it is obvious that the variable step size INC algorithm has the best reliability than both HC and P&O algorithms for the near to real Simulink® model of photovoltaic modules. With a 60 Wp photovoltaic module, the daily maximum power reaches 50.76 W against 34.40 W when the photovoltaic parameters are fixed. Meanwhile, the daily average energy is 263 Wh/day against 195 Wh/day.

  20. Ink jet printable silver metallization with zinc oxide for front side metallization for micro crystalline silicon solar cells

    Science.gov (United States)

    Jurk, Robert; Fritsch, Marco; Eberstein, Markus; Schilm, Jochen; Uhlig, Florian; Waltinger, Andreas; Michaelis, Alexander

    2015-12-01

    Ink jet printable water based inks are prepared by a new silver nanoparticle synthesis and the addition of nanoscaled ZnO particles. For the formation of front side contacts the inks are ink jet printed on the front side of micro crystalline silicon solar cells, and contact the cell directly during the firing step by etching through the wafers’ anti-reflection coating (ARC). In terms of Ag dissolution and precipitation the mechanism of contact formation can be compared to commercial glass containing thick film pastes. This avoids additional processing steps, like laser ablation, which are usually necessary to open the ARC prior to ink jet printing. As a consequence process costs can be reduced. In order to optimize the ARC etching and contact formation during firing, zinc oxide nanoparticles are investigated as an ink additive. By utilization of in situ contact resistivity measurements the mechanism of contacting was explored. Our results show that silver inks containing ZnO particles realize a specific contact resistance below 10 mΩṡcm2. By using a multi-pass ink jet printing and plating process a front side metallization of commercial 6  ×  6 inch2 standard micro crystalline silicone solar cells with emitter resistance of 60 Ω/◽ was achieved and showed an efficiency of 15.7%.

  1. Light-induced performance increase of silicon heterojunction solar cells

    KAUST Repository

    Kobayashi, Eiji

    2016-10-11

    Silicon heterojunction solar cells consist of crystalline silicon (c-Si) wafers coated with doped/intrinsic hydrogenated amorphous silicon (a-Si:H) bilayers for passivating-contact formation. Here, we unambiguously demonstrate that carrier injection either due to light soaking or (dark) forward-voltage bias increases the open circuit voltage and fill factor of finished cells, leading to a conversion efficiency gain of up to 0.3% absolute. This phenomenon contrasts markedly with the light-induced degradation known for thin-film a-Si:H solar cells. We associate our performance gain with an increase in surface passivation, which we find is specific to doped a-Si:H/c-Si structures. Our experiments suggest that this improvement originates from a reduced density of recombination-active interface states. To understand the time dependence of the observed phenomena, a kinetic model is presented.

  2. Effect of the initial structure on the electrical property of crystalline silicon films deposited on glass by hot-wire chemical vapor deposition.

    Science.gov (United States)

    Chung, Yung-Bin; Lee, Sang-Hoon; Bae, Sung-Hwan; Park, Hyung-Ki; Jung, Jae-Soo; Hwang, Nong-Moon

    2012-07-01

    Crystalline silicon films on an inexpensive glass substrate are currently prepared by depositing an amorphous silicon film and then crystallizing it by excimer laser annealing, rapid thermal annealing, or metal-induced crystallization because crystalline silicon films cannot be directly deposited on glass at a low temperature. It was recently shown that by adding HCI gas in the hot-wire chemical vapor deposition (HWCVD) process, the crystalline silicon film can be directly deposited on a glass substrate without additional annealing. The electrical properties of silicon films prepared using a gas mixture of SiH4 and HCl in the HWCVD process could be further improved by controlling the initial structure, which was achieved by adjusting the delay time in deposition. The size of the silicon particles in the initial structure increased with increasing delay time, which increased the mobility and decreased the resistivity of the deposited films. The 0 and 5 min delay times produced the silicon particle sizes of approximately 10 and approximately 28 nm, respectively, in the initial microstructure, which produced the final films, after deposition for 300 sec, of resistivities of 0.32 and 0.13 Omega-cm, mobilities of 1.06 and 1.48 cm2 V(-1) S(-1), and relative densities of 0.87 and 0.92, respectively.

  3. A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF4{text{-}H2{text{-}}He} PECVD

    Science.gov (United States)

    Losurdo, M.; Giangregorio, M.; Grimaldi, A.; Capezzuto, P.; Bruno, G.

    2004-06-01

    Fully microcrystalline silicon, μc-Si, thin films (polyimide substrates by plasma enhanced chemical vapor deposition (PECVD) using SiF{4}-H{2}-He. The effect of deposition temperature on the structure, i.e., crystallinity and density, of μc-Si films is investigated by spectroscopic ellipsometry in the 1.5 {-}5.5 eV energy range. Modeling of spectroscopic ellipsometry data is used for highlighting crystallinity of the substrate/film interface, i.e., the absence of any amorphous incubation layer. It is found that film crystallinity does not depend on film thickness, and it increases with the decrease of deposition temperature. The temperature dependence is explained on the basis of a like-Arrhenius kinetic analysis of the etching process by atomic fluorine and hydrogen of both μc-Si and a-Si phases.

  4. Research on the effects of machining-induced subsurface damages on mono-crystalline silicon via molecular dynamics simulation

    Energy Technology Data Exchange (ETDEWEB)

    Zhao Hongwei, E-mail: hwzhao@jlu.edu.cn [College of Mechanical Science and Engineering, Jilin University, 5988 Renmin Street, Changchun, Jilin 130025 (China); Shi Chengli; Zhang Peng; Zhang Lin; Huang Hu; Yan Jiwang [College of Mechanical Science and Engineering, Jilin University, 5988 Renmin Street, Changchun, Jilin 130025 (China)

    2012-10-15

    Highlights: Black-Right-Pointing-Pointer MD simulations of nano-cutting process are carried out to obtain machining-induced subsurface with diamond cutting tools. Black-Right-Pointing-Pointer After cutting, the crystal lattice reconstructed and led to the formation of the machined surface. Black-Right-Pointing-Pointer The mechanical properties of the pristine and machining-induced subsurface Si are studied by means of nanoindentation. Black-Right-Pointing-Pointer Nanoindentation results show that the hardness of the machined surface was smaller than mono-crystalline Si. - Abstract: Nanoindentation simulation via molecular dynamic (MD) method was carried out to investigate the characteristics of machining-induced subsurface damage of mono-crystalline silicon with a spherical diamond indenter. In this study, MD simulations of nano-cutting process were carried out firstly to cut through the specimen's surface with diamond cutting tools of different edge radius of 0 nm, 3 nm and 5 nm respectively. Then, MD simulation of nanoindentation on the machined surface was carried out. Tersoff potential was used to model the interaction of Si atoms, and the interaction between Si and C atoms was modeled by Morse potential. Simulational results indicate that during cutting process, the specimen undergo plastic deformation and phase transformation. After cutting process, the crystal lattice reconstructs and the residual amorphous layers lead to the formation of the machined surface. Nanoindentation results show that the hardness of the machined surface is smaller than mono-crystalline Si. So in order to get accurate properties of the pristine silicon or other semiconductor materials via experiments, the amorphous phase should be completely removed or it would influence the mechanical properties of the pristine materials.

  5. Hydrogen passivation of electrically active defects in crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Milstein, J B; Tsuo, Y S; Osterwald, C R; White, C W

    1984-06-01

    We have observed significant improvements in the efficiencies of dendritic web and edge-supported-pulling (ESP) silicon sheet solar cells after hydrogen ion beam passivation for a period of ten minutes or less. We have studied the effects of the hydrogen ion beam treatment with respect to silicon material damage, silicon sputter rate, introduction of impurities, and changes in reflectance. We have determined that the silicon sputter rate for a constant ion beam flux of 0.60 +- 0.05 mA/cm/sup 2/ exhibits a maximum at approximately 1400 eV ion beam energy. We have observed that hydrogen ion beam treatment can result in a reduced fill factor, which is caused by damage to the front metallization of the cell rather than by damage to the p-n junction.

  6. Microscopic surface structure of C/SiC composite mirrors for space cryogenic telescopes

    CERN Document Server

    Enya, Keigo; Kaneda, Hidehiro; Onaka, Takashi; Ozaki, Tuyoshi; Kume, Masami

    2007-01-01

    We report on the microscopic surface structure of carbon-fiber-reinforced silicon carbide (C/SiC) composite mirrors that have been improved for the Space Infrared Telescope for Cosmology and Astrophysics (SPICA) and other cooled telescopes. The C/SiC composite consists of carbon fiber, silicon carbide, and residual silicon. Specific microscopic structures are found on the surface of the bare C/SiC mirrors after polishing. These structures are considered to be caused by the different hardness of those materials. The roughness obtained for the bare mirrors is 20 nm rms for flat surfaces and 100 nm rms for curved surfaces. It was confirmed that a SiSiC slurry coating is effective in reducing the roughness to 2 nm rms. The scattering properties of the mirrors were measured at room temperature and also at 95 K. No significant change was found in the scattering properties through cooling, which suggests that the microscopic surface structure is stable with changes in temperature down to cryogenic values. The C/SiC ...

  7. Angstrom resolved imaging of charge percolation through the interface between phosphorous doped crystalline silicon and silicon dioxide

    Science.gov (United States)

    Ambal, Kapildep; Rahe, Philipp; Williams, Clayton C.; Boehme, Christoph

    2014-03-01

    Using a high resolution (~100fm/√{ Hz} spectral noise density) scanning probe at T ~4K, we measure currents through the interface between phosphorus doped ([P] ~ 1017-10qualitatively distinct I-V responses, each of which is identified with charge percolation from P donors to the cantilever either with or without different kinds of silicon dangling bond involvement. We acknowledge support by the National Science Foundation, Major Research Instrumentation Program #0959328.

  8. Si-C linked organic monolayers on crystalline silicon surfaces as alternative gate insulators

    NARCIS (Netherlands)

    Faber, E.J.; Smet, de L.C.P.M.; Olthuis, W.; Zuilhof, H.; Sudhölter, E.J.R.; Bergveld, P.; Berg, van den A.

    2005-01-01

    Herein, the influence of silicon surface modification via SiCnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type 100 and n-type 100 silicon is studied by forming MIS (metal-insulator-semiconductor) diodes using a mercury probe. From current density-voltage (J-V) and capacitance-voltage (C-V) me

  9. Si-C linked organic monolayers on crystalline silicon surfaces as alternative gate insulators

    NARCIS (Netherlands)

    Faber, E.J.; Smet, de L.C.P.M.; Olthuis, W.; Zuilhof, H.; Sudhölter, E.J.R.; Bergveld, P.; Berg, van den A.

    2005-01-01

    Herein, the influence of silicon surface modification via SiCnH2n+1 (n=10,12,16,22) monolayer-based devices on p-type 100 and n-type 100 silicon is studied by forming MIS (metal-insulator-semiconductor) diodes using a mercury probe. From current density-voltage (J-V) and capacitance-voltage (C-V)

  10. Single-Crystalline Silicon Solar Cell with Selective Emitter Formed by Screen Printing and Chemical Etching Method: A Feasibility Study

    Directory of Open Access Journals (Sweden)

    Yen-Po Chen

    2013-01-01

    Full Text Available A new method for fabricating crystalline silicon solar cells with selective emitters is presented. In this method, shallow trenches corresponding to metal contact area are first formed by screen printing and chemical etching, followed by heavy doping over the whole front surface of the silicon wafer. After a polymer mask is pasted by aligned screen-printing to cover the shallow trenches, the silicon wafer is etched such that the heavy doping remains at the shallow trench area, while other areas become lightly doped. With the presented method, two screening printing steps are required for obtaining a selective emitter structure on a solar wafer. Compared with existing etch-back methods, the presented one is believed to be able to easily conform with present industrial process. Experimental results show that optical responses at the short and long wavelengths were both improved by applying the proposed selective emitter technique to fabricate solar cells with an a-Si:H film deposited on the back surface. The selective emitter cell with a-Si:H back surface deposition had improvements of 1.66 mA/cm2 and 1.23% absolute in Jsc and conversion efficiency, respectively, compared to the reference cell that had a homogeneous emitter and no a-Si:H on the back surface.

  11. Numerical investigation of thermal history and residual stress of grown multi-crystalline silicon at the various growth stages for PV applications

    Science.gov (United States)

    Srinivasan, M.; Ramasamy, P.

    2016-05-01

    The directional solidification is a very important technique for growing high quality multi-crystalline silicon at large scale for PV solar cells. Time dependent numerical modelling of the temperature distribution, residual stress in multi-crystalline silicon ingots grown by directional solidification has been investigated for five growth stage. The computation was carried in a 2D axis symmetric model by the finite volume method. The history of temperature distribution, stress generation, are tracked in our modelling continuously to consider the growth process from the beginning to the end of solidification process. This paper is aimed to achieve an advanced understanding of the thermal and mechanical behavior of grown crystal.

  12. Surface passivation and optical characterization of Al2O3/a-SiCx stacks on c-Si substrates.

    Science.gov (United States)

    López, Gema; Ortega, Pablo R; Voz, Cristóbal; Martín, Isidro; Colina, Mónica; Morales, Anna B; Orpella, Albert; Alcubilla, Ramón

    2013-01-01

    The aim of this work is to study the surface passivation of aluminum oxide/amorphous silicon carbide (Al2O3/a-SiCx) stacks on both p-type and n-type crystalline silicon (c-Si) substrates as well as the optical characterization of these stacks. Al2O3 films of different thicknesses were deposited by thermal atomic layer deposition (ALD) at 200 °C and were complemented with a layer of a-SiCx deposited by plasma-enhanced chemical vapor deposition (PECVD) to form anti-reflection coating (ARC) stacks with a total thickness of 75 nm. A comparative study has been carried out on polished and randomly textured wafers. We have experimentally determined the optimum thickness of the stack for photovoltaic applications by minimizing the reflection losses over a wide wavelength range (300-1200 nm) without compromising the outstanding passivation properties of the Al2O3 films. The upper limit of the surface recombination velocity (S eff,max) was evaluated at a carrier injection level corresponding to 1-sun illumination, which led to values below 10 cm/s. Reflectance values below 2% were measured on textured samples over the wavelength range of 450-1000 nm.

  13. Surface passivation and optical characterization of Al2O3/a-SiCx stacks on c-Si substrates

    Directory of Open Access Journals (Sweden)

    Gema López

    2013-11-01

    Full Text Available The aim of this work is to study the surface passivation of aluminum oxide/amorphous silicon carbide (Al2O3/a-SiCx stacks on both p-type and n-type crystalline silicon (c-Si substrates as well as the optical characterization of these stacks. Al2O3 films of different thicknesses were deposited by thermal atomic layer deposition (ALD at 200 °C and were complemented with a layer of a-SiCx deposited by plasma-enhanced chemical vapor deposition (PECVD to form anti-reflection coating (ARC stacks with a total thickness of 75 nm. A comparative study has been carried out on polished and randomly textured wafers. We have experimentally determined the optimum thickness of the stack for photovoltaic applications by minimizing the reflection losses over a wide wavelength range (300–1200 nm without compromising the outstanding passivation properties of the Al2O3 films. The upper limit of the surface recombination velocity (Seff,max was evaluated at a carrier injection level corresponding to 1-sun illumination, which led to values below 10 cm/s. Reflectance values below 2% were measured on textured samples over the wavelength range of 450–1000 nm.

  14. 18th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes; Workshop Proceedings, 3-6 August 2008, Vail, Colorado

    Energy Technology Data Exchange (ETDEWEB)

    Sopori, B. L.

    2008-09-01

    The National Center for Photovoltaics sponsored the 18th Workshop on Crystalline Silicon Solar Cells & Modules: Materials and Processes, held in Vail, CO, August 3-6, 2008. This meeting provided a forum for an informal exchange of technical and scientific information between international researchers in the photovoltaic and relevant non-photovoltaic fields. The theme of this year's meeting was 'New Directions for Rapidly Growing Silicon Technologies.'

  15. A review of manufacturing metrology for improved reliability of silicon photovoltaic modules

    Science.gov (United States)

    Davis, Kristopher O.; Walters, Joseph; Schneller, Eric; Seigneur, Hubert; Brooker, R. Paul; Scardera, Giuseppe; Rodgers, Marianne P.; Mohajeri, Nahid; Shiradkar, Narendra; Dhere, Neelkanth G.; Wohlgemuth, John; Rudack, Andrew C.; Schoenfeld, Winston V.

    2014-10-01

    In this work, the use of manufacturing metrology across the supply chain to improve crystalline silicon (c-Si) photovoltaic (PV) module reliability and durability is addressed. Additionally, an overview and summary of a recent extensive literature survey of relevant measurement techniques aimed at reducing or eliminating the probability of field failures is presented. An assessment of potential gaps is also given, wherein the PV community could benefit from new research and demonstration efforts. This review is divided into three primary areas representing different parts of the c-Si PV supply chain: (1) feedstock production, crystallization and wafering; (2) cell manufacturing; and (3) module manufacturing.

  16. Review of the Potential of the Ni/Cu Plating Technique for Crystalline Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Atteq ur Rehman

    2014-02-01

    Full Text Available Developing a better method for the metallization of silicon solar cells is integral part of realizing superior efficiency. Currently, contact realization using screen printing is the leading technology in the silicon based photovoltaic industry, as it is simple and fast. However, the problem with metallization of this kind is that it has a lower aspect ratio and higher contact resistance, which limits solar cell efficiency. The mounting cost of silver pastes and decreasing silicon wafer thicknesses encourages silicon solar cell manufacturers to develop fresh metallization techniques involving a lower quantity of silver usage and not relying pressing process of screen printing. In recent times nickel/copper (Ni/Cu based metal plating has emerged as a metallization method that may solve these issues. This paper offers a detailed review and understanding of a Ni/Cu based plating technique for silicon solar cells. The formation of a Ni seed layer by adopting various deposition techniques and a Cu conducting layer using a light induced plating (LIP process are appraised. Unlike screen-printed metallization, a step involving patterning is crucial for opening the masking layer. Consequently, experimental procedures involving patterning methods are also explicated. Lastly, the issues of adhesion, back ground plating, process complexity and reliability for industrial applications are also addressed.

  17. High-temperature protective coatings for C/SiC composites

    Directory of Open Access Journals (Sweden)

    Xiang Yang

    2014-12-01

    Full Text Available Carbon fiber-reinforced silicon carbide (C/SiC composites were well-established light weight materials combining high specific strength and damage tolerance. For high-temperature applications, protective coatings had to provide oxidation and corrosion resistance. The literature data introduced various technologies and materials, which were suitable for the application of coatings. Coating procedures and conditions, materials design limitations related to the reactivity of the components of C/SiC composites, new approaches and coating systems to the selection of protective coatings materials were examined. The focus of future work was on optimization by further multilayer coating systems and the anti-oxidation ability of C/SiC composites at temperatures up to 2073 K or higher in water vapor.

  18. SUBSTRATE EFFECT ON HYDROGENATED MICROCRYSTALLINE SILICON FILMS DEPOSITED WITH VHF-PECVD TECHNIQUE

    Institute of Scientific and Technical Information of China (English)

    H.D. Yang

    2006-01-01

    Raman spectra and scanning electron microscope (SEM) techniques were used to determine the structural properties of microcrystalline siliconc-Si:H) films deposited on different substrates with the very high frequency plasma-enhanced chemical vapor deposition ( VHF-PECVD )technique. Using the Raman spectra, the values of crystalline volume fraction Xc and average grain size d are 86%, 12.3nm; 65%, 5.45nm; and 38%, 4.05nm, for single crystalline silicon wafer,corning 7059 glass, and general optical glass substrates, respectively. The SEM images further demonstrate the substrate effect on the film surface roughness. For the single crystalline silicon wafer and Corning 7059 glass, the surfaces of the μc-Si:H films are fairly smooth because of the homogenous growth or little lattice mismatch. But for general optical glass, the surface of the μc-Si:H film is very rough, thus the growing surface roughness affects the crystallization process and determines the average grain size of the deposited material. Moreover, with the measurements of thickness, photo and dark conductivity, photosensitivity and activation energy, the substrate effect on the deposition rate, optical and electrical properties of the μc-Si:H thin films have also been investigated. On the basis of the above results, it can be concluded that the substrates affect the initial growing layers acting as a seed for the formation of a crystalline-like material, and then the deposition rates, optical and electrical properties are also strongly influenced, hence,deposition parameter optimization is the key method that can be used to obtain a good initial growing layer, to realize the deposition of μc-Si:H films with device-grade quality on cheap substrates such as general glass.

  19. Single-crystal cubic silicon carbide: an in vivo biocompatible semiconductor for brain machine interface devices.

    Science.gov (United States)

    Frewin, Christopher L; Locke, Christopher; Saddow, Stephen E; Weeber, Edwin J

    2011-01-01

    Single crystal silicon carbide (SiC) is a wide band-gap semiconductor which has shown both bio- and hemo-compatibility [1-5]. Although single crystalline SiC has appealing bio-sensing potential, the material has not been extensively characterized. Cubic silicon carbide (3C-SiC) has superior in vitro biocompatibility compared to its hexagonal counterparts [3, 5]. Brain machine interface (BMI) systems using implantable neuronal prosthetics offer the possibility of bi-directional signaling, which allow sensory feedback and closed loop control. Existing implantable neural interfaces have limited long-term reliability, and 3C-SiC may be a material that may improve that reliability. In the present study, we investigated in vivo 3C-SiC biocompatibility in the CNS of C56BL/6 mice. 3C-SiC was compared against the known immunoreactive response of silicon (Si) at 5, 10, and 35 days. The material was examined to detect CD45, a protein tyrosine phosphatase (PTP) expressed by activated microglia and macrophages. The 3C-SiC surface revealed limited immunoresponse and significantly reduced microglia compared to Si substrate.

  20. Electrical analysis of high dielectric constant insulator and metal gate metal oxide semiconductor capacitors on flexible bulk mono-crystalline silicon

    KAUST Repository

    Ghoneim, Mohamed T.

    2015-06-01

    We report on the electrical study of high dielectric constant insulator and metal gate metal oxide semiconductor capacitors (MOSCAPs) on a flexible ultra-thin (25 μm) silicon fabric which is peeled off using a CMOS compatible process from a standard bulk mono-crystalline silicon substrate. A lifetime projection is extracted using statistical analysis of the ramping voltage (Vramp) breakdown and time dependent dielectric breakdown data. The obtained flexible MOSCAPs operational voltages satisfying the 10 years lifetime benchmark are compared to those of the control MOSCAPs, which are not peeled off from the silicon wafer. © 2014 IEEE.

  1. Composition and crystallinity of silicon nanoparticles synthesised by hot wire thermal catalytic pyrolysis at different pressures

    CSIR Research Space (South Africa)

    Scriba, MR

    2009-04-01

    Full Text Available The effect of pressure on the structure and composition of silicon nanoparticles synthesized by hot wire thermal catalytic pyrolysis (HW-TCP) of pure silane has been investigated. Light brown powders were produced at silane pressures of 10 and 50...

  2. In-Situ Measurement of Power Loss for Crystalline Silicon Modules Undergoing Thermal Cycling and Mechanical Loading Stress Testing: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Spataru, Sergiu; Hacke, Pater; Sera, Dezso

    2015-09-15

    We analyze the degradation of multi-crystalline silicon photovoltaic modules undergoing simultaneous thermal, mechanical, and humidity stress testing to develop a dark environmental chamber in-situ measurement procedure for determining module power loss. From the analysis we determine three main categories of failure modes associated with the module degradation consisting of: shunting, recombination losses, increased series resistance losses, and current mismatch losses associated with a decrease in photo-current generation by removal of some cell areas due to cell fractures. Based on the analysis, we propose an in-situ module power loss monitoring procedure that relies on dark current-voltage measurements taken during the stress test, and initial and final module flash testing, to determine the power degradation characteristic of the module.

  3. Fundamental Research and Development for Improved Crystalline Silicon Solar Cells: Final Subcontract Report, March 2002 - July 2006

    Energy Technology Data Exchange (ETDEWEB)

    Rohatgi, A.

    2007-11-01

    This report summarizes the progress made by Georgia Tech in the 2002-2006 period toward high-efficiency, low-cost crystalline silicon solar cells. This program emphasize fundamental and applied research on commercial substrates and manufacturable technologies. A combination of material characterization, device modeling, technology development, and complete cell fabrication were used to accomplish the goals of this program. This report is divided into five sections that summarize our work on i) PECVD SiN-induced defect passivation (Sections 1 and 2); ii) the effect of material inhomogeneity on the performance of mc-Si solar cells (Section 3); iii) a comparison of light-induced degradation in commercially grown Ga- and B-doped Czochralski Si ingots (Section 4); and iv) the understanding of the formation of high-quality thick-film Ag contacts on high sheet-resistance emitters (Section 5).

  4. In-Situ Measurement of Power Loss for Crystalline Silicon Modules Undergoing Thermal Cycling and Mechanical Loading Stress Testing: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Spataru, Sergiu; Hacke, Pater; Sera, Dezso

    2015-09-15

    We analyze the degradation of multi-crystalline silicon photovoltaic modules undergoing simultaneous thermal, mechanical, and humidity stress testing to develop a dark environmental chamber in-situ measurement procedure for determining module power loss. From the analysis we determine three main categories of failure modes associated with the module degradation consisting of: shunting, recombination losses, increased series resistance losses, and current mismatch losses associated with a decrease in photo-current generation by removal of some cell areas due to cell fractures. Based on the analysis, we propose an in-situ module power loss monitoring procedure that relies on dark current-voltage measurements taken during the stress test, and initial and final module flash testing, to determine the power degradation characteristic of the module.

  5. Mismatched front and back gratings for optimum light trapping in ultra-thin crystalline silicon solar cells

    Science.gov (United States)

    Hsu, Wei-Chun; Tong, Jonathan K.; Branham, Matthew S.; Huang, Yi; Yerci, Selçuk; Boriskina, Svetlana V.; Chen, Gang

    2016-10-01

    The implementation of a front and back grating in ultra-thin photovoltaic cells is a promising approach towards improving light trapping. A simple design rule was developed using the least common multiple (LCM) of the front and back grating periods. From this design rule, several optimal period combinations can be found, providing greater design flexibility for absorbers of indirect band gap materials. Using numerical simulations, the photo-generated current (Jph) for a 10-μm-thick crystalline silicon absorber was predicted to be as high as 38 mA/cm2, which is 11.74% higher than that of a single front grating (Jph=34 mA/cm2).

  6. Characterization of transparent conductive oxide films and their effect on amorphous/crystalline silicon heterojunction solar cells

    Science.gov (United States)

    Meng, Fanying; Shi, Jianhua; Shen, Leilei; Zhang, Liping; Liu, Jinning; Liu, Yucheng; Yu, Jian; Bao, Jian; Liu, Zhengxin

    2017-04-01

    Three different dopant indium oxide thin films were fabricated at low temperatures by reactive plasma deposition and sputtering. The optical and electrical characteristics of these films were analyzed as a function of the Hall electron concentration. Furthermore, these films were applied to amorphous/crystalline silicon heterojunction solar cells as transparent electrodes. Consequently, it was demonstrated that the high Hall mobility, high refractive index, and low extinction coefficient of transparent conductive oxide (TCO) films contribute to the high product of short-circuit current density and fill factor and conversion efficiency. Furthermore, it was found that the solar cell with a finger spacing of 1.9 mm on a 125 × 125 mm2 Si wafer is highly tolerant to TCO film resistivity when the electron concentration is less than 4.0 × 1020 cm-3.

  7. Direct writing of continuous and discontinuous sub-wavelength periodic surface structures on single-crystalline silicon using femtosecond laser

    Energy Technology Data Exchange (ETDEWEB)

    Kuladeep, Rajamudili; Sahoo, Chakradhar; Narayana Rao, Desai, E-mail: dnrsp@uohyd.ernet.in, E-mail: dnr-laserlab@yahoo.com [School of Physics, University of Hyderabad, Hyderabad 500046 (India)

    2014-06-02

    Laser-induced ripples or uniform arrays of continuous near sub-wavelength or discontinuous deep sub-wavelength structures are formed on single-crystalline silicon (Si) by femtosecond (fs) laser direct writing technique. Laser irradiation was performed on Si wafers at normal incidence in air and by immersing them in dimethyl sulfoxide using linearly polarized Ti:sapphire fs laser pulses of ∼110 fs pulse duration and ∼800 nm wavelength. Morphology studies of laser written surfaces reveal that sub-wavelength features are oriented perpendicular to laser polarization, while their morphology and spatial periodicity depend on the surrounding dielectric medium. The formation mechanism of the sub-wavelength features is explained by interference of incident laser with surface plasmon polaritons. This work proves the feasibility of fs laser direct writing technique for the fabrication of sub-wavelength features, which could help in fabrication of advanced electro-optic devices.

  8. Comparison of slowness profiles of lamb wave with elastic moduli and crystal structure in single crystalline silicon wafers

    Energy Technology Data Exchange (ETDEWEB)

    Min, Young Jae; Yun, Gyeong Won; Kim, Kyung Min; Roh, Yuji; Kim, Young H. [Applied Acoustics Lab, Korea Science Academy of KAIST, Busan (Korea, Republic of)

    2016-02-15

    Single crystalline silicon wafers having (100), (110), and (111) directions are employed as specimens for obtaining slowness profiles. Leaky Lamb waves (LLW) from immersed wafers were detected by varying the incident angles of the specimens and rotating the specimens. From an analysis of LLW signals for different propagation directions and phase velocities of each specimen, slowness profiles were obtained, which showed a unique symmetry with different symmetric axes. Slowness profiles were compared with elastic moduli of each wafer. They showed the same symmetries as crystal structures. In addition, slowness profiles showed expected patterns and values that can be inferred from elastic moduli. This implies that slowness profiles can be used to examine crystal structures of anisotropic solids.

  9. Low-temperature grown indium oxide nanowire-based antireflection coatings for multi-crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Yu-Cian; Chen, Chih-Yao; Chen, I Chen [Institute of Materials Science and Engineering, National Central University, Taoyuan (China); Kuo, Cheng-Wen; Kuan, Ta-Ming; Yu, Cheng-Yeh [TSEC Corporation, Hsinchu (China)

    2016-08-15

    Light harvesting by indium oxide nanowires (InO NWs) as an antireflection layer on multi-crystalline silicon (mc-Si) solar cells has been investigated. The low-temperature growth of InO NWs was performed in electron cyclotron resonance (ECR) plasma with an O{sub 2}-Ar system using indium nanocrystals as seed particles via the self-catalyzed growth mechanism. The size-dependence of antireflection properties of InO NWs was studied. A considerable enhancement in short-circuit current (from 35.39 to 38.33 mA cm{sup -2}) without deterioration of other performance parameters is observed for mc-Si solar cells coated with InO NWs. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  10. Improving Crystalline Silicon Solar Cell Efficiency Using Graded-Refractive-Index SiON/ZnO Nanostructures

    OpenAIRE

    Yung-Chun Tu; Shui-Jinn Wang; Chien-Hung Wu; Kow-Ming Chang; Tseng-Hsing Lin; Chien-Hsiung Hung; Jhen-Siang Wu

    2015-01-01

    The fabrication of silicon oxynitride (SiON)/ZnO nanotube (NT) arrays and their application in improving the energy conversion efficiency (η) of crystalline Si-based solar cells (SCs) are reported. The SiON/ZnO NT arrays have a graded-refractive-index that varies from 3.5 (Si) to 1.9~2.0 (Si3N4 and ZnO) to 1.72~1.75 (SiON) to 1 (air). Experimental results show that the use of 0.4 μm long ZnO NT arrays coated with a 150 nm thick SiON film increases Δη/η by 39.2% under AM 1.5 G (100 mW/cm2) ill...

  11. 16th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes; Program, Extended Abstracts, and Papers

    Energy Technology Data Exchange (ETDEWEB)

    Sopori, B. L.

    2006-08-01

    The National Center for Photovoltaics sponsored the 16th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes held August 6-9, 2006 in Denver, Colorado. The workshop addressed the fundamental properties of PV-Si, new solar cell designs, and advanced solar cell processing techniques. It provided a forum for an informal exchange of technical and scientific information between international researchers in the photovoltaic and relevant non-photovoltaic fields. The Workshop Theme was: "Getting more (Watts) for Less ($i)". A combination of oral presentations by invited speakers, poster sessions, and discussion sessions reviewed recent advances in crystal growth, new cell structures, new processes and process characterization techniques, and cell fabrication approaches suitable for future manufacturing demands. The special sessions included: Feedstock Issues: Si Refining and Purification; Metal-impurity Engineering; Thin Film Si; and Diagnostic Techniques.

  12. Plasma etching on large-area mono-, multi- and quasi-mono crystalline silicon

    DEFF Research Database (Denmark)

    Davidsen, Rasmus Schmidt; Schmidt, Michael Stenbæk; Boisen, Anja

    2013-01-01

    We use plasma etched Black Si (BS)[1][2] nanostructures to achieve low reflectance due to the resulting graded refractive index at the Si-air interface. The goal of this investigation is to develop a suitable texturing method for Si solar cells. Branz et al. [3]report below 3% average reflectance...... advantages such as; (i) excellent light trapping, (ii) dry, single-sided and scalable process method and (iii) etch independence on crystallinity of Si, RIE-texturing has so far not been proven superior to standard wet texturing, primarily as a result of lower power conversion efficiency due to increased...... using maskless RIE in a O2 and SF6 plasma, and the surface topology was optimized for solar cell applications by varying gas flows, pressure, power and process time. The starting substrates were 156x156 mm p-type, CZ mono-, multi- and quasi-mono crystalline Si wafers, respectively, with a thickness...

  13. Studying the Kinetics of Crystalline Silicon Nanoparticle Lithiation with In Situ Transmission Electron Microscopy

    KAUST Repository

    McDowell, Matthew T.

    2012-09-04

    In situ transmission electron microscopy (TEM) is used to study the electrochemical lithiation of high-capacity crystalline Si nanoparticles for use in Li-ion battery anodes. The lithiation reaction slows down as it progresses into the particle interior, and analysis suggests that this behavior is due not to diffusion limitation but instead to the influence of mechanical stress on the driving force for reaction. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  14. Silicon Monoxide at 1 atm and Elevated Pressures: Crystalline or Amorphous?

    KAUST Repository

    AlKaabi, Khalid

    2014-03-05

    The absence of a crystalline SiO phase under ordinary conditions is an anomaly in the sequence of group 14 monoxides. We explore theoretically ordered ground-state and amorphous structures for SiO at P = 1 atm, and crystalline phases also at pressures up to 200 GPa. Several competitive ground-state P = 1 atm structures are found, perforce with Si-Si bonds, and possessing Si-O-Si bridges similar to those in silica (SiO2) polymorphs. The most stable of these static structures is enthalpically just a little more stable than a calculated random bond model of amorphous SiO. In that model we find no segregation into regions of amorphous Si and amorphous SiO2. The P = 1 atm structures are all semiconducting. As the pressure is increased, intriguing new crystalline structures evolve, incorporating Si triangular nets or strips and stishovite-like regions. A heat of formation of crystalline SiO is computed; it is found to be the most negative of all the group 14 monoxides. Yet, given the stability of SiO2, the disproportionation 2SiO (s) → Si(s)+SiO2(s) is exothermic, falling right into the series of group 14 monoxides, and ranging from a highly negative ΔH of disproportionation for CO to highly positive for PbO. There is no major change in the heat of disproportionation with pressure, i.e., no range of stability of SiO with respect to SiO2. The high-pressure SiO phases are metallic. © 2014 American Chemical Society.

  15. Plasma etching on large-area mono-, multi- and quasi-mono crystalline silicon

    DEFF Research Database (Denmark)

    Davidsen, Rasmus Schmidt; Schmidt, Michael Stenbæk; Boisen, Anja

    2013-01-01

    We use plasma etched Black Si (BS)[1][2] nanostructures to achieve low reflectance due to the resulting graded refractive index at the Si-air interface. The goal of this investigation is to develop a suitable texturing method for Si solar cells. Branz et al. [3]report below 3% average reflectance...... for their 16.8% efficient black Si cell using a metal-assisted, chemical etching method on FZ mono-crystalline Si substrates. Yoo et al. [4] use RIE similar to this work on large-area, multi-crystalline Si cells and achieve a 16.1% efficiency despite a relatively high reflectance of 13.3%. Despite several...... advantages such as; (i) excellent light trapping, (ii) dry, single-sided and scalable process method and (iii) etch independence on crystallinity of Si, RIE-texturing has so far not been proven superior to standard wet texturing, primarily as a result of lower power conversion efficiency due to increased...

  16. New Feedstock for c-Si Photovoltaics

    Science.gov (United States)

    Kravtsov, Alexey; Shagun, Alexander; Kravtsov, Anatoly

    2015-03-01

    Results from functional tests of highly doped silicon purified with electron beam melting, a new feedstock for photovoltaics are presented. Possibility of obtaining dislocation free single crystals from such feedstock in typical industrial processes (CZ and FZ) is shown, crystals' parameters are tested for coherence with requirements for PV silicon.

  17. 15th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes; Extended Abstracts and Papers

    Energy Technology Data Exchange (ETDEWEB)

    Sopori, B. L.

    2005-11-01

    The National Center for Photovoltaics sponsored the 15th Workshop on Crystalline Silicon Solar Cells & Modules: Materials and Processes, held in Vail, CO, August 7-10, 2005. This meeting provided a forum for an informal exchange of technical and scientific information between international researchers in the photovoltaic and relevant non-photovoltaic fields. The workshop addressed the fundamental properties of PV silicon, new solar cell designs, and advanced solar cell processing techniques. A combination of oral presentations by invited speakers, poster sessions, and discussion sessions reviewed recent advances in crystal growth, new cell designs, new processes and process characterization techniques, and cell fabrication approaches suitable for future manufacturing demands. The theme of this year's meeting was 'Providing the Scientific Basis for Industrial Success.' Specific sessions during the workshop included: Advances in crystal growth and material issues; Impurities and defects in Si; Advanced processing; High-efficiency Si solar cells; Thin Si solar cells; and Cell design for efficiency and reliability module operation. The topic for the Rump Session was ''Si Feedstock: The Show Stopper'' and featured a panel discussion by representatives from various PV companies.

  18. A fair comparison between ultrathin crystalline-silicon solar cells with either periodic or correlated disorder inverted pyramid textures.

    Science.gov (United States)

    Muller, Jérôme; Herman, Aline; Mayer, Alexandre; Deparis, Olivier

    2015-06-01

    Fabrication of competitive solar cells based on nano-textured ultrathin silicon technology is challenging nowadays. Attention is paid to the optimization of this type of texture, with a lot of simulation and experimental results published in the last few years. While previous studies discussed mainly the local features of the surface texture, we highlight here the importance of their filling fraction. In this work, we focus on a fair comparison between a technologically realizable correlated disorder pattern of inverted nano-pyramids on an ultrathin crystalline-silicon layer, and its periodically patterned counterpart. A fair comparison is made possible by defining an equivalent periodic structure for each hole filling fraction. Moreover, in order to be as realistic as possible, we consider patterns that could be fabricated by standard patterning techniques: hole-mask colloidal lithography, nanoimprint lithography and wet chemical etching. Based on numerical simulations, we show that inverted nano-pyramid patterns with correlated disorder provide typically greater efficiency than their periodic counterparts. However, the hole filling fraction of the etched pattern plays a crucial role and may limit the benefits of the correlated disorder due to experimental restrictions on pattern fabrication.

  19. Application and validation of algebraic methods to predict the behaviour of crystalline silicon PV modules in Mediterranean climates

    Energy Technology Data Exchange (ETDEWEB)

    Fuentes, M.; Nofuentes, G.; Aguilera, J.; Talavera, D.L. [Grupo de Investigacion IDEA, Escuela Politecnica Superior, Universidad de Jaen, Campus de Las Lagunillas, s/n, 23071-Jaen (Spain); Castro, M. [Electrical and Computer Engineering Department, UNED, Ciudad Universitaria, Juan del Rosal, 12, 28040-Madrid (Spain)

    2007-11-15

    Predicting both PV module and generator performances under natural sunlight is a key issue for designers and installers. Five simple algebraic methods addressed to predict this behaviour in Mediterranean climates have been empirically validated. Firstly, the calibration in STC of all significant electrical parameters of both a monocrystalline and a polycrystalline silicon PV modules was entrusted to an accredited independent laboratory. Then, a 12-month test and measurement campaign carried out on these modules in the city of Jaen (Spain, latitude 38 N, longitude 3 W) has provided the necessary experimental data. Results show that (a) crystalline silicon PV module outdoors performance may be described with sufficient accuracy - for PV engineering purposes - only taking into account incident global irradiance, cell temperature, and using any one of two simple algebraic methods tried in this paper and (b) regardless the used method, poor results may be achieved if the PV specimens under study are not electrically characterised in STC prior to analysing their outdoors performance. Even so, the methods recommended in (a) perform best. (author)

  20. Capturing Structural Dynamics in Crystalline Silicon Using Chirped Electrons from a Laser Wakefield Accelerator

    Science.gov (United States)

    He, Z.-H.; Beaurepaire, B.; Nees, J. A.; Gallé, G.; Scott, S. A.; Pérez, J. R. Sánchez; Lagally, M. G.; Krushelnick, K.; Thomas, A. G. R.; Faure, J.

    2016-11-01

    Recent progress in laser wakefield acceleration has led to the emergence of a new generation of electron and X-ray sources that may have enormous benefits for ultrafast science. These novel sources promise to become indispensable tools for the investigation of structural dynamics on the femtosecond time scale, with spatial resolution on the atomic scale. Here, we demonstrate the use of laser-wakefield-accelerated electron bunches for time-resolved electron diffraction measurements of the structural dynamics of single-crystal silicon nano-membranes pumped by an ultrafast laser pulse. In our proof-of-concept study, we resolve the silicon lattice dynamics on a picosecond time scale by deflecting the momentum-time correlated electrons in the diffraction peaks with a static magnetic field to obtain the time-dependent diffraction efficiency. Further improvements may lead to femtosecond temporal resolution, with negligible pump-probe jitter being possible with future laser-wakefield-accelerator ultrafast-electron-diffraction schemes.

  1. Sintering of nano crystalline silicon carbide by doping with boron carbide

    Indian Academy of Sciences (India)

    M S Datta; A K Bandyopadhyay; B Chaudhuri

    2002-06-01

    Sinterable nano silicon carbide powders of mean particle size (37 nm) were prepared by attrition milling and chemical processing of an acheson type alpha silicon carbide having mean particle size of 0.39 m (390 nm). Pressureless sintering of these powders was achieved by addition of boron carbide of 0.5 wt% together with carbon of 1 wt% at 2050°C at vacuum (3 mbar) for 15 min. Nearly 99% sintered density was obtained. The mechanism of sintering was studied by scanning electron microscopy and transmission electron microscopy. This study shows that the mechanism is a solid-state sintering process. Polytype transformation from 6H to 4H was observed.

  2. Crystalline silicon surface passivation by thermal ALD deposited Al doped ZnO thin films

    Directory of Open Access Journals (Sweden)

    Jagannath Panigrahi

    2017-03-01

    Full Text Available The evidence of good quality silicon surface passivation using thermal ALD deposited Al doped zinc oxide (AZO thin films is demonstrated. AZO films are prepared by introducing aluminium precursor in between zinc and oxygen precursors during the deposition. The formation of AZO is confirmed by ellipsometry, XRD and Hall measurements. Effective minority carrier lifetime (τeff greater than 1.5ms at intermediate bulk injection levels is realized for symmetrically passivated p-type silicon surfaces under optimised annealing conditions of temperature and time in hydrogen ambient. The best results are realised at 450°C annealing for >15min. Such a layer may lead to implied open circuit voltage gain of 80mV.

  3. Comparison of specific production performances by two crystalline silicon PV systems

    Directory of Open Access Journals (Sweden)

    Martin Fajman

    2013-01-01

    Full Text Available A comparison of two independent photovoltaic (PV systems located close to each other on the south of the Czech Moravian Highland was accomplished. Due to differences in installation parameters; reference quantities were used to calculate transformed data sets for specific production performances comparison. Differences in monthly and annually daily production were performed by t-test.According to obtained results, it was concluded that annually mean daily productions per 1 kWp of installed capacity and per 1 m2 of active area of the panels are significantly better by single crystal silicon installation in tracking system than by stable installation of a different technology of single crystal silicon. However, comparing this performance per 1 m2 of occupied land by studied power-plants the stable installation performed higher production rates on daily mean basis in majority of months of the year 2010 as well as by annually mean daily production.

  4. On the origin of inter band gap radiative emission in crystalline silicon

    Directory of Open Access Journals (Sweden)

    I. Burud

    2012-12-01

    Full Text Available Crystal imperfections degrade the quality of multicrystalline silicon wafers by introducing alternative recombination mechanisms. Here we use non-destructive hyperspectral imaging to detect photoluminescence signals from radiatively active recombination processes over the wafer with a highly resolved spectral third dimension. We demonstrate that band-to-band recombination can be visually separated from recombination through traps across the whole surface of a wafer using hyperspectral imaging. Our samples are studied in the near infrared wavelength region, 900-1700 nm, which includes the region of the so called D-band emission lines. These constitute four resolved emission lines found in the photoluminescence spectrum of silicon, commonly related to recombination through shallow inter-band gap energy levels near the conduction- and valence band edges. The shape and structure of these emissions from our measurements suggest that all the D-lines have different origins.

  5. Optimization of sodium carbonate texturization on large-area crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Marrero, N.; Gonzalez-Diaz, B.; Guerrero-Lemus, R.; Hernandez-Rodriguez, C. [Departamento de Fisica Basica, Universidad de La Laguna, Avda, Astrofisico Francisco Sanchez, 38204 La Laguna, S/C de Tenerife (Spain); Borchert, D. [Auf der Reihe 2, Institut fuer Solare Energiesysteme, Fraunhofer Institut, 45884 Gelsenkirchen (Germany)

    2007-12-14

    This work describes a texturization method for monocrystalline silicon solar cells based on a mixture of sodium carbonate and sodium hydrogen carbonate solutions. A specific solution has been found that results in an optimal etching rate, the lowest surface reflectance and a homogeneous density of pyramidal structures on the silicon surface. The subsequent phosphorus diffusion with rapid thermal processes has been modified in order to drastically reduce the process time and, simultaneously, to obtain a high homogeneity of the sheet resistance values and improved photocarriers lifetimes. 100 x 100 mm solar cells with an efficiency of 15.8% have been obtained compared to an efficiency of 14.7% for the reference cell. (author)

  6. Capturing Structural Dynamics in Crystalline Silicon Using Chirped Electrons from a Laser Wakefield Accelerator

    CERN Document Server

    He, Z -H; Nees, J A; Gallé, G; Scott, S A; Pérez, J R Sanchez; Lagally, M G; Krushelnick, K; Thomas, A G R; Faure, J

    2016-01-01

    Recent progress in laser wakefield acceleration has led to the emergence of a new generation of electron and X-ray sources that may have enormous benefits for ultrafast science. These novel sources promise to become indispensable tools for the investigation of structural dynamics on the femtosecond time scale, with spatial resolution on the atomic scale. Here, we demonstrate the use of laser-wakefield-accelerated electron bunches for time-resolved electron diffraction measurements of the structural dynamics of single-crystal silicon nano-membranes pumped by an ultrafast laser pulse. In our proof-of-concept study, we resolve the silicon lattice dynamics on a picosecond time scale by deflecting the momentum-time correlated electrons in the diffraction peaks with a static magnetic field to obtain the time-dependent diffraction efficiency. Further improvements may lead to femtosecond temporal resolution, with negligible pump-probe jitter being possible with future laser-wakefield-accelerator ultrafast-electron-di...

  7. Structural defects caused by a rough substrate and their influence on the performance of hydrogenated nano-crystalline silicon n-i-p solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hongbo B.T.; Franken, Ronald H.; Rath, Jatindra K.; Schropp, Ruud E.I. [Nanophotonics - Physics of Devices, Debye Institute for Nanomaterials Science, Faculty of Science, Utrecht University, P.O. Box 80.000, 3508 TA Utrecht (Netherlands)

    2009-03-15

    We present a cross-sectional transmission electron microscopy study of a set of hydrogenated nano-crystalline silicon n-i-p solar cells deposited by hot-wire chemical vapour deposition on Corning glass substrates coated with ZnO-covered Ag layers with various surface roughnesses. Strip-like structural defects (voids and low-density areas) are observed in the silicon layers originating from micro-valleys of Ag grains. A correlation between the opening angles of the textured surface and the appearance of these strips was found. We propose that in order to grow high-quality hydrogenated nano-crystalline silicon absorber layers for solar cell applications, the morphology of the Ag surface is a critical property, and the micro-valleys at the ZnO surface with an opening angle smaller than around 110 should be avoided. (author)

  8. Improved amorphous/crystalline silicon interface passivation for heterojunction solar cells by low-temperature chemical vapor deposition and post-annealing treatment.

    Science.gov (United States)

    Wang, Fengyou; Zhang, Xiaodan; Wang, Liguo; Jiang, Yuanjian; Wei, Changchun; Xu, Shengzhi; Zhao, Ying

    2014-10-07

    In this study, hydrogenated amorphous silicon (a-Si:H) thin films are deposited using a radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system. The Si-H configuration of the a-Si:H/c-Si interface is regulated by optimizing the deposition temperature and post-annealing duration to improve the minority carrier lifetime (τeff) of a commercial Czochralski (Cz) silicon wafer. The mechanism of this improvement involves saturation of the microstructural defects with hydrogen evolved within the a-Si:H films due to the transformation from SiH2 into SiH during the annealing process. The post-annealing temperature is controlled to ∼180 °C so that silicon heterojunction solar cells (SHJ) could be prepared without an additional annealing step. To achieve better performance of the SHJ solar cells, we also optimize the thickness of the a-Si:H passivation layer. Finally, complete SHJ solar cells are fabricated using different temperatures for the a-Si:H film deposition to study the influence of the deposition temperature on the solar cell parameters. For the optimized a-Si:H deposition conditions, an efficiency of 18.41% is achieved on a textured Cz silicon wafer.

  9. Dislocation formation in seed crystals induced by feedstock indentation during growth of quasimono crystalline silicon ingots

    Science.gov (United States)

    Trempa, M.; Beier, M.; Reimann, C.; Roßhirth, K.; Friedrich, J.; Löbel, C.; Sylla, L.; Richter, T.

    2016-11-01

    In this work the dislocation formation in the seed crystal induced by feedstock indentation during the growth of quasimono (QM) silicon ingots for photovoltaic application was investigated. It could be shown by special laboratory indentation experiments that the formed dislocations propagate up to several millimeters deep into the volume of the seed crystal in dependence on the applied pressure of the feedstock particles on the surface of the seed crystal. Further, it was demonstrated that these dislocations if they were not back-melted during the seeding process grow further into the silicon ingot and drastically reduce its material quality. An estimation of the apparent pressure values in a G5 industrial crucible/feedstock setup reveals that the indentation phenomenon is a critical issue for the industrial production of QM silicon ingots. Therefore, some approaches to avoid/reduce the indentation events were tested with the result, that the most promising solution should be the usage of suitable feedstock particles as coverage of the seed.

  10. Optimization of n/i and i/p buffer layers in n-i-p hydrogenated microcrystalline silicon solar cells

    Institute of Scientific and Technical Information of China (English)

    Yuan Yujie; Hou Guofu; Zhang Jianjun; Xue Junming; Cao Liran; Zhao Ying; Geng Xinhua

    2009-01-01

    Hydrogenated microcrystalline siliconc-Si:H) intrinsic films and solar cells with n-i-p configuration were prepared by plasma enhanced chemical vapor deposition (PECVD). The influence of n/i and i/p buffer layerson the μc-Si:H cell performance was studied in detail. The experimental results demonstrated that the efficiency is much improved when there is a higher crystallinity at n/i interface and an optimized a-Si:H buffer layer at i/p interface. By combining the above methods, the performance ofμc-Si:H single-junction and a-Si:H/μc-Si:H tandemsolar ceils has been significantly improved.

  11. Self-diffusion in crystalline silicon: A single diffusion activation enthalpy down to 755°

    Science.gov (United States)

    Südkamp, Tobias; Bracht, Hartmut

    2016-09-01

    Self-diffusion in silicon and the contribution of vacancies and self-interstitials have been controversially discussed for 50 yr. Most recent results show that the intrinsic silicon self-diffusion coefficient deviates from an Arrhenius-type, single exponential function for temperatures below 950° [Y. Shimizu, M. Uematsu, and K. M. Itoh, Phys. Rev. Lett. 98, 095901 (2007), 10.1103/PhysRevLett.98.095901; R. Kube, H. Bracht, E. Hüger, H. Schmidt, J. L. Hansen, A. N. Larsen, J. W. Ager, E. E. Haller, T. Geue, and J. Stahn, Phys. Rev. B 88, 085206 (2013), 10.1103/PhysRevB.88.085206]. This led us to propose temperature-dependent thermodynamic properties of vacancies in order to achieve full consistency to vacancy-mediated dopant diffusion in silicon. Concepts of temperature-dependent properties of native defects or distinct forms of defects with different formation entropies suggested by Cowern et al. [N. E. B. Cowern, S. Simdyankin, C. Ahn, N. S. Bennett, J. P. Goss, J.-M. Hartmann, A. Pakfar, S. Hamm, J. Valentin, E. Napolitani, D. De Salvador, E. Bruno, and S. Mirabella, Phys. Rev. Lett. 110, 155501 (2013), 10.1103/PhysRevLett.110.155501] question the present understanding on atomic transport in semiconductors. To verify these concepts, additional self-diffusion experiments under particular gettering conditions were performed. As a result, silicon self-diffusion was found to be accurately described by one single diffusion activation enthalpy of (4.73 ±0.02 ) eV down to 755°C. This provides full consistency to dopant diffusion without claiming native-defect concepts that were originally proposed by Seeger and Chik in 1968 [A. Seeger and K. P. Chik, Phys. Stat. Sol. 29, 455 (1968), 10.1002/pssb.19680290202] and confirms most recent density functional theory calculations on the activation energy of self-diffusion via vacancies and self-interstitials. Overall, this unravels the old debate of self-diffusion in silicon with the supposed intrinsic temperature dependence.

  12. Dynamic Chemically Driven Dewetting, Spreading, and Self-Running of Sessile Droplets on Crystalline Silicon.

    Science.gov (United States)

    Arscott, Steve

    2016-12-06

    A chemically driven dewetting effect is demonstrated using sessile droplets of dilute hydrofluoric acid on chemically oxidized silicon wafers. The dewetting occurs as the thin oxide is slowly etched by the droplet and replaced by a hydrogen-terminated surface; the result of this is a gradual increase in the contact angle of the droplet with time. The time-varying work of adhesion is calculated from the time-varying contact angle; this corresponds to the changing chemical nature of the surface during dewetting and can be modeled by the well-known logistic (sigmoid) function often used for the modeling of restricted growth, in this case, the transition from an oxidized surface to a hydrogen-terminated silicon surface. The observation of the time-varying contact angle allows one to both measure the etch rate of the silicon oxide and estimate the hydrogenation rate as a function of HF concentration and wafer type. In addition to this, at a certain HF concentration, a self-running droplet effect is observed. In contrast, on hydrogen-terminated silicon wafers, a chemically induced spreading effect is observed using sessile droplets of nitric acid. The droplet spreading can also be modeled using a logistical function, where the restricted growth is the transition from hydrogen-terminated to a chemically induced oxidized silicon surface. The chemically driven dewetting and spreading observed here add to the methods available to study dynamic wetting (e.g., the moving three-phase contact line) of sessile droplets on surfaces. By slowing down chemical kinetics of the wetting, one is able to record the changing profile of the sessile droplet with time and gather information concerning the time-varying surface chemistry. The data also indicates a chemical interface hysteresis (CIH) that is compared to contact angle hysteresis (CAH). The approach can also be used to study the chemical etching and deposition behavior of thin films using liquids by monitoring the macroscopic

  13. Improved efficiency for nanopillar array of c-Si photovoltaic by down-conversion and anti-reflection of quantum dots

    Science.gov (United States)

    Lin, Chien-chung; Chen, Hsin-Chu; Han, Hau-Vei; Tsai, Yu-Lin; Chang, Chia-Hua; Tsai, Min-An; Kuo, Hao-Chung; Yu, Peichen

    2012-02-01

    Improvement of efficiency for crystalline silicon (c-Si) with nanopillar arrays (NPAs) solar cell was demonstrated by deployment of CdS quantum dots (QDs). The NPAs was fabricated by colloidal lithography of self-assembled polystyrene (PS) nanospheres with a 600 nm in size and reactive-ion etching techniques, and then a colloidal CdS QDs with a concentration of 5 mg/mL was spun on the surface of c-Si with NPAs solar cell. Under a simulated one-sun condition, the device with CdS QDs shows a 33% improvement of power conversion efficiency, compared with the one without QDs. Additionally, we also found that the device with CdS QDs shows a 32% reduction in electrical resistance, compared with the one without QDs solar cell, under an ultraviolet (UV) light of 355nm illumination. This reduced electrical resistance can directly contribute to our fill-factor (FF) enhancement. For further investigation, the excitation spectrum of photoluminescence (PL), absorbance spectrum, current-voltage (I-V) characteristics, reflectance and external quantum efficiency (EQE) of the device were measured and analyzed. Based on the spectral response and optical measurement, we believe that CdS QDs not only have the capability for photon down-conversion in ultraviolet region, but also provide extra antireflection capability.

  14. 2D SiC/SiC composite for flow channel insert (FCI) application

    Energy Technology Data Exchange (ETDEWEB)

    Yu Haijiao [Key Laboratory of Advanced Ceramic Fibers and Composites, College of Aerospace and Materials Engineering, National University of Defense Technology, 47 Yanwachi Street, Changsha 410073 (China); Zhou Xingui, E-mail: zhouxinguilmy@163.com [Key Laboratory of Advanced Ceramic Fibers and Composites, College of Aerospace and Materials Engineering, National University of Defense Technology, 47 Yanwachi Street, Changsha 410073 (China); Wang Honglei; Zhao Shuang [Key Laboratory of Advanced Ceramic Fibers and Composites, College of Aerospace and Materials Engineering, National University of Defense Technology, 47 Yanwachi Street, Changsha 410073 (China); Wu Yican; Huang Qunying; Zhu Zhiqiang [Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China); Huang Zelan [Chongyi Zhangyuan Tungsten Co. Ltd., Chongyi 341300 (China)

    2010-12-15

    Two-dimensional (2D) silicon carbide fiber reinforced silicon carbide matrix (SiC/SiC) composite suiting for flow channel insert (FCI) application was successfully fabricated by stacking molding-precursor impregnation and pyrolysis (PIP) process. Plain-woven KD-I SiC fiber fabric was used as the reinforcement. SiC coating was deposited as the fiber/matrix interphase layer by chemical vapor deposition (CVD) technique. Mechanical, thermal and electrical properties of the 2D SiC/SiC composite were investigated. The results show that mechanical properties and through thickness thermal conductivity of the 2D KD-I/PIP SiC composite well meet the FCI application requirements; meanwhile, it seems that the electrical conductivity requirement will also be satisfied with a series of improvements.

  15. Investigation of the chemical interaction in the TiC-Si3N4 system

    Directory of Open Access Journals (Sweden)

    Izhevskyi V.A.

    1999-01-01

    Full Text Available Chemical interaction in the TiCSi3N4 system was investigated. Thermodynamic calculations and kinetic analysis were carried out for a number of powder mixtures with various TiC:Si3N4 molar ratios in the temperature range 1300-1750 °C. Stability regions of the TiC-Si3N4 composites were defined. It was shown that the main reaction products are silicon carbide and titanium carbonitride. The overall chemical interaction is described in terms of chemical reaction between titanium carbide and silicon nitride, and the diffusion of carbon and nitrogen through the coherent reaction products layer after completion of the initial direct interaction of the components.

  16. Current Status and Recent Research Achievements in SiC/SiC Composites

    Energy Technology Data Exchange (ETDEWEB)

    Katoh, Yutai; Snead, Lance L.; Henager, Charles H.; Nozawa, T.; Hinoki, Tetsuya; Ivekovic, Aljaz; Novak, Sasa; Gonzalez de Vicente, Sehila M.

    2014-12-01

    The development and maturation of the silicon carbide fiber-reinforced silicon carbide matrix (SiC/SiC) composite system for fusion applications has seen the evolution from fundamental development and understanding of the material system and its behavior in a hostile irradiation environment to the current effort which essentially is a broad-based program of technology, directed at moving this material class from a laboratory curiosity to an engineering material. This paper lays out the recent international scientific and technological achievements in the development of SiC/SiC composite material technologies for fusion application and will discuss future research directions. It also reviews the materials system in the larger context of progress to maturity as an engineering material for both the larger nuclear community and for general engineering applications.

  17. Current status and recent research achievements in SiC/SiC composites

    Energy Technology Data Exchange (ETDEWEB)

    Katoh, Y., E-mail: katohy@ornl.gov [Oak Ridge National Laboratory, Oak Ridge, TN (United States); Snead, L.L. [Oak Ridge National Laboratory, Oak Ridge, TN (United States); Henager, C.H. [Pacific Northwest National Laboratory, Richland, WA (United States); Nozawa, T. [Japan Atomic Energy Agency, Rokkasho, Aomori (Japan); Hinoki, T. [Institute of Advanced Energy, Kyoto University, Kyoto (Japan); Iveković, A.; Novak, S. [Jožef Stefan Institute, Ljubljana (Slovenia); Gonzalez de Vicente, S.M. [EFDA Close Support Unit, Garching (Germany)

    2014-12-15

    The silicon carbide fiber-reinforced silicon carbide matrix (SiC/SiC) composite system for fusion applications has seen a continual evolution from development a fundamental understanding of the material system and its behavior in a hostile irradiation environment to the current effort which is directed at a broad-based program of technology maturation program. In essence, over the past few decades this material system has steadily moved from a laboratory curiosity to an engineering material, both for fusion structural applications and other high performance application such as aerospace. This paper outlines the recent international scientific and technological achievements towards the development of SiC/SiC composite material technologies for fusion application and discusses future research directions. It also reviews the materials system in the larger context of progress to maturity as an engineering material for both the larger nuclear community and broader engineering applications.

  18. Correlation between the fine structure of spin-coated PEDOT:PSS and the photovoltaic performance of organic/crystalline-silicon heterojunction solar cells

    Science.gov (United States)

    Funda, Shuji; Ohki, Tatsuya; Liu, Qiming; Hossain, Jaker; Ishimaru, Yoshihiro; Ueno, Keiji; Shirai, Hajime

    2016-07-01

    We investigated the relationship between the fine structure of spin-coated conductive polymer poly(3,4-ethylenedioxythiphene):poly(styrene sulfonate) (PEDOT:PSS) films and the photovoltaic performance of PEDOT:PSS crystalline-Si (PEDOT:PSS/c-Si) heterojunction solar cells. Real-time spectroscopic ellipsometry revealed that there were two different time constants for the formation of the PEDOT:PSS network. Upon removal of the polar solvent, the PEDOT:PSS film became optically anisotropic, indicating a conformational change in the PEDOT and PSS chain. Polarized Fourier transform infrared attenuated total reflection absorption spectroscopy and Raman spectroscopy measurements also indicated that thermal annealing promoted an in-plane π-conjugated Cα = Cβ configuration attributed to a thiophene ring in PEDOT and an out-of-plane configuration of -SO3 groups in the PSS chain with increasing composition ratio of oxidized (benzoid) to neutral (quinoid) PEDOT, Iqui/Iben. The highest power conversion efficiency for the spin-coated PEDOT:PSS/c-Si heterojunction solar cells was 13.3% for Iqui/Iben = 9-10 without employing any light harvesting methods.

  19. Metastability of a-SiOx:H thin films for c-Si surface passivation

    Science.gov (United States)

    Serenelli, L.; Martini, L.; Imbimbo, L.; Asquini, R.; Menchini, F.; Izzi, M.; Tucci, M.

    2017-01-01

    The adoption of a-SiOx:H films obtained by PECVD in heterojunction solar cells is a key to further increase their efficiency, because of its transparency in the UV with respect to the commonly used a-Si:H. At the same time this layer must guarantee high surface passivation of the c-Si to be suitable in high efficiency solar cell manufacturing. On the other hand the application of amorphous materials like a-Si:H and SiNx on the cell frontside expose them to the mostly energetic part of the sun spectrum, leading to a metastability of their passivation properties. Moreover as for amorphous silicon, thermal annealing procedures are considered as valuable steps to enhance and stabilize thin film properties, when performed at opportune temperature. In this work we explored the reliability of a-SiOx:H thin film layers surface passivation on c-Si substrates under UV exposition, in combination with thermal annealing steps. Both p- and n-type doped c-Si substrates were considered. To understand the effect of UV light soaking we monitored the minority carriers lifetime and Sisbnd H and Sisbnd O bonding, by FTIR spectra, after different exposure times to light coming from a deuterium lamp, filtered to UV-A region, and focused on the sample to obtain a power density of 50 μW/cm2. We found a certain lifetime decrease after UV light soaking in both p- and n-type c-Si passivated wafers according to a a-SiOx:H/c-Si/a-SiOx:H structure. The role of a thermal annealing, which usually enhances the as-deposited SiOx passivation properties, was furthermore considered. In particular we monitored the UV light soaking effect on c-Si wafers after a-SiOx:H coating by PECVD and after a thermal annealing treatment at 300 °C for 30 min, having selected these conditions on the basis of the study of the effect due to different temperatures and durations. We correlated the lifetime evolution and the metastability effect of thermal annealing to the a-SiOx:H/c-Si interface considering the evolution

  20. C/SiC Component & Material Analysis, Attachment Verification, & Blisk Turbopump Testing

    Science.gov (United States)

    Effinger, Michael R.; Genge, Gary; Gregg, Wayne; Jordan, William

    1999-01-01

    Ceramic composite blisk components constructed of carbon fibers & silicon carbide ceramic matrix have been fabricated and tested. Room and cryogenic torque testing have verified the attachment configuration. The polar and quasi-isotropic blisks have been proof spun, balanced, and tested in the Simplex turbopump. Foreign particle impact analysis was conducted for C/SiC. Data and manufacturing lessons learned are significantly benefiting the development of the Reusable Launch Vehicle's ceramic matrix composite integrally bladed disk.

  1. Heterointegration of III-V on silicon using a crystalline oxide buffer layer

    Science.gov (United States)

    Bhatnagar, K.; Rojas-Ramirez, J. S.; Contreras-Guerrero, R.; Caro, M.; Droopad, R.

    2015-09-01

    The integration of III-V compound semiconductors with Si can combine the cost advantage and maturity of Si technology with the superior performance of III-V materials. We have achieved the heteroepitaxial growth of III-V compound semiconductors on a crystalline SrTiO3 buffer layer grown on Si(0 0 1) substrates. A two-step growth process utilizing a high temperature nucleation layer of GaAs, followed by a low-temperature GaAs layer at a higher growth rate was employed to achieve highly crystalline thick GaAs layers on the SrTiO3/Si substrates with low surface roughness as seen by AFM. The effect of the GaAs nucleation layer on different surface terminations for the SrTiO3 layer was studied for both on axis and miscut wafers, which led to the conclusion that the Sr terminated surface on miscut substrates provides the best GaAs films. Using GaAs/STO/Si as virtual substrates, we have optimized the growth of high quality GaSb using the interfacial misfit (IMF) dislocation array technique. This work can lead to the possibility of realizing infrared detectors and next-generation high mobility III-V CMOS within the existing Si substrate infrastructure.

  2. High-temperature CVD for crystalline-silicon thin-film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Faller, F.R.; Hurrle, A.

    1999-10-01

    The fundamentals of thermal CVD for the deposition of silicon at high temperatures are briefly discussed and applied to the conditions in the CVD system that the authors have constructed and characterized. The system fulfills basic requirements to be met for solar cell application; solar cells made from epitaxial layers on various substrates were fabricated. The high-quality cells achieved 17.6% efficiency proving the excellent performance of the system, the cells on economically relevant substrates achieved 8% efficiency which still needs improvement.

  3. Defects left after regrowth of amorphous silicon on crystalline Si : C (V) and DLTS studies

    OpenAIRE

    Castaing, J.; Cass, T.

    1985-01-01

    n and p-type silicon have been self-ion implanted at 77 K with multi-energetic beams. This process was used to amorphize a 0.4 μm layer with a minimum amount of damage in the underlying crystal. After regrowth by a 550 °C anneal, the remaining defects were assessed by capacitance-voltage (C(V )) measurements and deep level transient spectroscopy (DLTS). In n-type Si, a buried layer of deep donors in large concentration was found, whereas in p-type Si, their concentration was small. These trap...

  4. Modeling and designing multilayer 2D perovskite / silicon bifacial tandem photovoltaics for high efficiencies and long-term stability.

    Science.gov (United States)

    Chung, Haejun; Sun, Xingshu; Mohite, Aditya D; Singh, Rahul; Kumar, Lokendra; Alam, Muhammad A; Bermel, Peter

    2017-04-17

    A key challenge in photovoltaics today is to develop cell technologies with both higher efficiencies and lower fabrication costs than incumbent crystalline silicon (c-Si) single-junction cells. While tandem cells have higher efficiencies than c-Si alone, it is generally challenging to find a low-cost, high-performance material to pair with c-Si. However, the recent emergence of 22% efficient perovskite photovoltaics has created a tremendous opportunity for high-performance, low-cost perovskite / crystalline silicon tandem photovoltaic cells. Nonetheless, two key challenges remain. First, integrating perovskites into tandem structures has not yet been demonstrated to yield performance exceeding commercially available crystalline silicon modules. Second, the stability of perovskites is inconsistent with the needs of most end-users, who install photovoltaic modules to produce power for 25 years or more. Making these cells viable thus requires innovation in materials processing, device design, fabrication, and yield. We will address these two gaps in the photovoltaic literature by investigating new types of 2D perovskite materials with n-butylammonium spacer layers, and integrating these materials into bifacial tandem solar cells providing at least 30% normalized power production. We find that an optimized 2D perovskite ((BA)2(MA)3(Sn0.6Pb0.4)4I13)/silicon bifacial tandem cell, given a globally average albedo of 30%, yields a normalized power production of 30.31%, which should be stable for extended time periods without further change in materials or encapsulation.

  5. Electrochemical degradation of amorphous-silicon photovoltaic modules

    Science.gov (United States)

    Mon, G. R.; Ross, R. G., Jr.

    Techniques of module electrochemical corrosion research, developed during reliability studies of crystalline-silicon modules (C-Si), have been applied to this new investigation into amorphous-silicon (a-Si) module reliability. Amorphous-Si cells, encapsulated in the polymers polyvinyl butyral (PVB) and ethylene vinyl acetate (EVA), were exposed for more than 1200 hours in a controlled 85 C/85 percent RH environment, with a constant 500 volts applied between the cells and an aluminum frame. Plotting power output reduction versus charge transferred reveals that about 50 percent a-Si cell failures can be expected with the passage of 0.1 to 1.0 Coulomb/cm of cell-frame edge length; this threshold is somewhat less than that determined for C-Si modules.

  6. 非晶硅/晶体硅(a-Si/c-Si)异质结%Property Investigation of a-Si/c-Si Hetero-Junction Structure

    Institute of Scientific and Technical Information of China (English)

    汪建强; 高华; 张剑; 张松; 李晨; 叶庆好; 孟凡英

    2011-01-01

    通过对非晶硅/晶体硅(a-Si/c-Si)异质结能带不连续、发射结掺杂以及界面态密度进行分析,研究它们对a-Si/c-Si异质结的界面特性,以及a-Si(N+)/c-Si(P)结构电池性能的影响.研究发现,能带不连续以及a-Si发射结高掺杂有利于实现界面复合机制由以悬挂键复合主导的复合机制向由少数载流子复合占主导的SRH(Shockly-Read-Hall)复合机制转变,有效降低界面复合速率.AFORS-HET软件模拟显示:在c-Si(P)衬底掺杂浓度为1.6×1016cm-3时,a-Si(N+)发射结掺杂浓度大于1.5×1020cm-3是获得高电池效率的必要条件;与短路电流密度相比,开路电压受a-Si/c-Si界面态密度影响更明显.%T his paper investigated the influence ot a-hi/c-bi band ottset, amorphous silicon emitter doping concentration and interface defects density on interface property of a-Si/c-Si structure. Band offset in a-Si(N+ )/c-Si(P) hetero-junction and a-Si emitter high level doping is very useful for the transformation of recombination mechanism from dangling bond to SRH (Shockly-Read-Hall). AFORS-HET simulation indicates that a-Si(N+ ) emitter doping level of over 1. 5X1020 cm~3 on c-Si(P) is an indispensable condition for achieving high efficiency. Comparing with density of short circuit current, open circuit voltage of a-Si/c-Si structure cell is much more susceptible to interface defect density.

  7. Mechanical grooving effect on the gettering efficiency of crystalline silicon based solar cells

    Science.gov (United States)

    Zarroug, Ahmed; Hamed, Zied Ben; Derbali, Lotfi; Ezzaouia, Hatem

    2017-04-01

    This paper examines a gettering process of Czochralski silicon (CZ) via mechanical texture, followed by two step heat treatment in the presence of porous silicon layer (PSL) under oxygen flow gas. It is shown that a process with PS has a positive trend of improvement in the electronic quality, and found to be more efficient when used in combination with mechanical grooving. We obtained a significant increase of the effective minority carrier lifetime and majority charge carriers mobility. Thus, there is an apparent decrease in the resistivity. These parameters were estimated through a The Quasi-Steady-State Photo-Conductance technique (QSSPC), the van Der Pauw method and Hall Effect. Particularly, we have made obvious that the large enhancement of the electronic quality of the wafers can be related to the presence of grooves, the influence during which the gettering process is of importance to overcome the unexpected saturation phenomena. The current voltage I-V characteristics of all samples had been measured under illumination. They were shown to enhance the photovoltaic properties of solar cells.

  8. Comparison of Photoluminescence Imaging on Starting Multi-Crystalline Silicon Wafers to Finished Cell Performance: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Johnston, S.; Yan, F.; Dorn, D.; Zaunbrecher, K.; Al-Jassim, M.; Sidelkheir, O.; Ounadjela, K.

    2012-06-01

    Photoluminescence (PL) imaging techniques can be applied to multicrystalline silicon wafers throughout the manufacturing process. Both band-to-band PL and defect-band emissions, which are longer-wavelength emissions from sub-bandgap transitions, are used to characterize wafer quality and defect content on starting multicrystalline silicon wafers and neighboring wafers processed at each step through completion of finished cells. Both PL imaging techniques spatially highlight defect regions that represent dislocations and defect clusters. The relative intensities of these imaged defect regions change with processing. Band-to-band PL on wafers in the later steps of processing shows good correlation to cell quality and performance. The defect band images show regions that change relative intensity through processing, and better correlation to cell efficiency and reverse-bias breakdown is more evident at the starting wafer stage as opposed to later process steps. We show that thermal processing in the 200 degrees - 400 degrees C range causes impurities to diffuse to different defect regions, changing their relative defect band emissions.

  9. A quantitative strain analysis of a flexible single-crystalline silicon membrane

    Science.gov (United States)

    Bong, Jae Hoon; Kim, Cheolgyu; Hwang, Wan Sik; Kim, Taek-Soo; Cho, Byung Jin

    2017-01-01

    This study presents a quantitative strain analysis of a single-crystal Si membrane for high performance flexible devices. Advanced thinning and transfer methods were used to make flexible single-crystal Si devices. Two Si membrane strain gauges, each with a different stack, were fabricated on a polydimethylsiloxane/polyimide film using a silicon-on-insulator wafer. One gauge contains a 10-μm-thick handling Si layer, whereas the handling Si layer was completely removed for the other case. Although the Si membrane with the 10-μm-thick handling Si layer is flexible, the strain applied to the active Si layer (0.127%) is three times higher than the strain applied to the Si membrane without the handling Si layer (0.037%) at a bending radius of 5 mm. This leads to the more reliable electrical and mechanical performance of the device fabricated on the Si membrane without the handling Si layer. The experimental results were verified through a finite element method simulation and analytical modeling. The quantitative strain analyses for flexible devices suggested here can expedite the realization of high performance flexible electronics using a single crystal silicon active layer.

  10. Crack Detection in Single-Crystalline Silicon Wafer Using Laser Generated Lamb Wave

    Directory of Open Access Journals (Sweden)

    Min-Kyoo Song

    2013-01-01

    Full Text Available In the semiconductor industry, with increasing requirements for high performance, high capacity, high reliability, and compact components, the crack has been one of the most critical issues in accordance with the growing requirement of the wafer-thinning in recent years. Previous researchers presented the crack detection on the silicon wafers with the air-coupled ultrasonic method successfully. However, the high impedance mismatching will be the problem in the industrial field. In this paper, in order to detect the crack, we propose a laser generated Lamb wave method which is not only noncontact, but also reliable for the measurement. The laser-ultrasonic generator and the laser-interferometer are used as a transmitter and a receiver, respectively. We firstly verified the identification of S0 and A0 lamb wave modes and then conducted the crack detection under the thermoelastic regime. The experimental results showed that S0 and A0 modes of lamb wave were clearly generated and detected, and in the case of the crack detection, the estimated crack size by 6 dB drop method was almost equal to the actual crack size. So, the proposed method is expected to make it possible to detect the crack in the silicon wafer in the industrial fields.

  11. Time domain simulation of tandem silicon solar cells with optimal textured light trapping enabled by the quadratic complex rational function.

    Science.gov (United States)

    Chung, H; Jung, K-Y; Tee, X T; Bermel, P

    2014-05-05

    Amorphous silicon/crystalline silicon (a-Si/c-Si) micromorph tandem cells, with best confirmed efficiency of 12.3%, have yet to fully approach their theoretical performance limits. In this work, we consider a strategy for improving the light trapping and charge collection of a-Si/c-Si micromorph tandem cells using random texturing with adjustable short-range correlations and long-range periodicity. In order to consider the full-spectrum absorption of a-Si and c-Si, a novel dispersion model known as a quadratic complex rational function (QCRF) is applied to photovoltaic materials (e.g., a-Si, c-Si and silver). It has the advantage of accurately modeling experimental semiconductor dielectric values over the entire relevant solar bandwidth from 300-1000 nm in a single simulation. This wide-band dispersion model is then used to model a silicon tandem cell stack (ITO/a-Si:H/c-Si:H/silver), as two parameters are varied: maximum texturing height h and correlation parameter f. Even without any other light trapping methods, our front texturing method demonstrates 12.37% stabilized cell efficiency and 12.79 mA/cm² in a 2 μm-thick active layer.

  12. Concentrator bifacial crystalline silicon solar cells with multi-wire metallization attached to TCO layers using transparent conductive polymers

    Science.gov (United States)

    Untila, Gennady; Chebotareva, Alla; Kost, Tatiana; Salazkin, Sergei; Shaposhnikova, Vera; Shvarts, Maxim

    2017-09-01

    Replacing expensive silver with inexpensive copper for the metallization of silicon wafer solar cells can lead to substantial reductions in material costs associated with cell production. A promising approach is the use of multi-wire design. This technology uses many wires in the place of busbars, and the copper wires are "soldered" during the low-temperature lamination process to the fingers (printed or plated) or to the transparent conductive oxide (TCO) layer, e.g. in the case of the α-Si/c-Si heterojunction cells. Here we describe a solar cell design in which wires are attached to TCO layers using transparent conductive polymer (TCP) films. To this end, we have synthesized a number of thermoplastics, poly(arylene ether ketone) copolymers (co-PAEKs), containing phthalide in their main chain. The fraction of phthalide-containing units in the copolymers was p = 3, 5, 15, and 50 mol %. With increasing p, the peak strain temperature of the co-PAEKs rises from 205 to 290 °C and their optical band gap and refractive index increase from 3.12 to 3.15 eV and from 1.6 to 1.614, respectively. The copolymers have a negligible absorption coefficient in the wavelength range 400- 1100 nm. When exposed to an excess pressure of 1 atm or above, co-PAEK films less than 30 µm in thickness undergo a transition from a dielectric to a conductive state. The resistivity (ρC) of wire/TCP/TCO (ITO = In2O3:Sn and IFO = In2O3:F) contacts ranges from 0.37 to 1.43 mΩ cm2. The polymer with the highest phthalide content (p = 50 mol %) has the lowest ρC. The average work of adhesion per unit area determined by pulling off the wires from the polymer surface depends on both the phthalide content of the co-PAEKs and their reduced viscosity, ranging from 14.3 to 43.5 N/cm. The highest value was obtained for the co-PAEK with p = 50 mol %. We have fabricated low-concentration bifacial IFO/(n+pp+)Cz-Si/ITO solar cells with a wire contact grid attached to IFO and ITO using a co-PAEK film. The

  13. The potential for the fabrication of wires embedded in the crystalline silicon substrate using the solid phase segregation of gold in crystallising amorphous volumes

    Energy Technology Data Exchange (ETDEWEB)

    Liu, A.C.Y.; McCallum, J.C

    2004-05-15

    The refinement of gold in crystallising amorphous silicon volumes was tested as a means of creating a conducting element embedded in the crystalline matrix. Amorphous silicon volumes were created by self-ion-implantation through a mask. Five hundred kiloelectronvolt Au{sup +} was then implanted into the volumes. The amorphous volumes were crystallised on a hot stage in air, and the crystallisation was characterised using cross sectional transmission electron microscopy. It was found that the amorphous silicon volumes crystallised via solid phase epitaxy at all the lateral and vertical interfaces. The interplay of the effects of the gold and also the hydrogen that infilitrated from the surface oxide resulted in a plug of amorphous material at the surface. Further annealing at this temperature demonstrated that the gold, once it had reached a certain critical concentration nucleated poly-crystalline growth instead of solid phase epitaxy. Time resolved reflectivity and Rutherford backscattering and channeling measurements were performed on large area samples that had been subject to the same implantation regime to investigate this system further. It was discovered that the crystallisation dynamics and zone refinement of the gold were complicated functions of both gold concentration and temperature. These findings do not encourage the use of this method to obtain conducting elements embedded in the crystalline silicon substrate.

  14. Effect of Environment on the Stress- Rupture Behavior of a C/SiC Composite Studied

    Science.gov (United States)

    Verrilli, Michael J.; Kiser, J. Douglas; Opila, Elizabeth J.; Calomino, Anthony M.

    2002-01-01

    Advanced reusable launch vehicles will likely incorporate fiber-reinforced ceramic matrix composites (CMC's) in critical propulsion and airframe components. The use of CMC's is highly desirable to save weight, improve reuse capability, and increase performance. One of the candidate CMC materials is carbon-fiber-reinforced silicon carbide (C/SiC). In potential propulsion applications, such as turbopump rotors and nozzle exit ramps, C/SiC components will be subjected to a service cycle that includes mechanical loading under complex, high-pressure environments containing hydrogen, oxygen, and steam. Degradation of both the C fibers and the SiC matrix are possible in these environments. The objective of this effort was to evaluate the mechanical behavior of C/SiC in various environments relevant to reusable launch vehicle applications. Stress-rupture testing was conducted at the NASA Glenn Research Center on C/SiC specimens in air and steam-containing environments. Also, the oxidation kinetics of the carbon fibers that reinforce the composite were monitored by thermogravimetric analysis in the same environments and temperatures used for the stress-rupture tests of the C/SiC composite specimens. The stress-rupture lives obtained for C/SiC tested in air and in steam/argon mixtures are shown in the following bar chart. As is typical for most materials, lives obtained at the lower temperature (600 C) are longer than for the higher temperature (1200 C). The effect of environment was most pronounced at the lower temperature, where the average test duration in steam at 600 C was at least 30 times longer than the lives obtained in air. The 1200 C data revealed little difference between the lives of specimens tested in air and steam at atmospheric pressure.

  15. Triple Layer Antireflection Design Concept for the Front Side of c-Si Heterojunction Solar Cell Based on the Antireflective Effect of nc-3C-SiC:H Emitter Layer

    Directory of Open Access Journals (Sweden)

    Erick Omondi Ateto

    2016-01-01

    Full Text Available We investigated the antireflective (AR effect of hydrogenated nanocrystalline cubic silicon carbide (nc-3C-SiC:H emitter and its application in the triple layer AR design for the front side of silicon heterojunction (SHJ solar cell. We found that the nc-3C-SiC:H emitter can serve both as an emitter and antireflective coating for SHJ solar cell, which enables us to realize the triple AR design by adding one additional dielectric layer to normally used SHJ structure with a transparent conductive oxide (TCO and an emitter layer. The optimized SHJ structure with the triple layer AR coating (LiF/ITO/nc-3C-SiC:H exhibit a short circuit current density (Jsc of 38.65 mA/cm2 and lower reflectivity of about 3.42% at wavelength range of 300 nm–1000 nm.

  16. Synthesis of Hybrid SiC/SiO2 Nanoparticles and Their Polymer Nanocomposites

    Science.gov (United States)

    Hassan, Tarig A.; Rangari, Vijaya K.; Baker, Fredric; Jeelani, Shaik

    2013-04-01

    In the present investigation, silicon carbide (β-SiC) nanoparticles ( 30 nm) were coated on silicon dioxide (SiO2) nanoparticles ( 200 nm) using sonochemical method. The resultant hybrid nanoparticles were then infused into SC-15 epoxy resin to enhance the thermal and mechanical properties of SC-15 epoxy for structural application. To fabricate an epoxy-based nanocomposite containing SiC/SiO2 hybrid nanoparticles, we have opted a two-step process. In the first step, the silica nanoparticles were coated with SiC nanoparticles using high intensity ultrasonic irradiation. In a second step, 1 wt.% of as-prepared SiC/SiO2 particles were dispersed in epoxy part-A (diglycidylether of bisphenol A) using a high intensity ultrasound for 30 min at 5°C. The part-B (cycloaliphatic amine hardener) of the epoxy was then mixed with part-A-SiC/SiO2 mixture using a high-speed mechanical stirrer for 10 min. The SiC/SiO2/epoxy resin mixture was cured at room temperature for 24 h. The SiC nanoparticles coating on SiO2 was characterized using X-ray diffraction (XRD) and high resolution transmission electron microscope (TEM). The as-prepared nanocomposite samples were characterized using thermo gravimetric analysis (TGA) and differential scanning calorimeter (DSC). Compression tests have been carried out for both nanocomposite and neat epoxy systems. The results indicated that 1 wt.% (SiC) + (SiO2) loading derived improvements in both thermal and mechanical properties when compared to the neat epoxy system.

  17. Crystalline silicon for thin film solar cells. Final report; Kristallines Silizium fuer Duennschichtsolarzellen. Schlussbericht

    Energy Technology Data Exchange (ETDEWEB)

    Wagner, H.

    2001-07-01

    Thin film solar cells based on silicon are of great interest for cost-effective conversion of solar energy into electric power. In order to reach this goal, intensive research is still necessary, pointing, e.g., to a further enhancement of the conversion efficiency, an improvement of stability and a reduction of the production time. Aim of the project work was the achievement of knowledge on microcrystalline silicon and its application in thin film solar cells by means of a broad research and development program. Material research focused on growth processes of the microcrystalline material, the incorporation and stability of hydrogen, the electronic transport and defects. In particular the transition from amorphous to microcrystalline material which is obtained for the present deposition methods by minor variations of the deposition parameters as well as the enhancement of the deposition rate were intensively studies. Another focus of research aimed toward the development and improvement of zinc oxide films which are of central importance for this type of solar cells for the application as transparent contacts. A comprehensive understanding was achieved. The films were incorporated in thin film solar cells and with conversion efficiencies >8% for single cells (at relatively high deposition rate) and 10% (stable) for tandem cells with amorphous silicon, top values were achieved by international standards. The project achievements serve as a base for a further development of this type of solar cell and for the transfer of this technology to industry. (orig.) [German] Duennschichtsolarzellen auf der Basis von Silizium sind von grossem Interesse fuer eine kostenguenstige Umwandlung von Sonnenenergie in elektrischen Strom. Um dieses Ziel zu erreichen, ist jedoch noch intensive Forschung, u.a. zur weiteren Steigerung des Wirkungsgrades, zur Verbesserung der Stabilitaet und zur Verkuerzung des Produktionsprozesses erforderlich. Ziel der Projektarbeiten war, durch ein

  18. Synthesis, structure and photoelectrochemical properties of single crystalline silicon nanowire arrays

    Energy Technology Data Exchange (ETDEWEB)

    Dalchiele, E.A., E-mail: dalchiel@fing.edu.u [Instituto de Fisica, Facultad de Ingenieria, Herrera y Reissig 565, C.C. 30, 11000 Montevideo (Uruguay); Martin, F.; Leinen, D. [Laboratorio de Materiales y Superficie (Unidad Asociada al CSIC), Departamentos de Fisica Aplicada and Ingenieria Quimica, Universidad de Malaga, Campus de Teatinos s/n, E29071 Malaga (Spain); Marotti, R.E. [Instituto de Fisica, Facultad de Ingenieria, Herrera y Reissig 565, C.C. 30, 11000 Montevideo (Uruguay); Ramos-Barrado, J.R. [Laboratorio de Materiales y Superficie (Unidad Asociada al CSIC), Departamentos de Fisica Aplicada and Ingenieria Quimica, Universidad de Malaga, Campus de Teatinos s/n, E29071 Malaga (Spain)

    2010-01-31

    In the present work, n-type silicon nanowire (n-SiNW) arrays have been synthesized by self-assembly electroless metal deposition (EMD) nanoelectrochemistry. The synthesized n-SiNW arrays have been submitted to scanning electron microscopy (SEM), transmission electron microscopy (TEM), high-resolution transmission electron microscopy (HRTEM), X-ray photoelectron spectroscopy (XPS), and optical studies. Initial probes of the solar device conversion properties and the photovoltaic parameters such as short-circuit current, open-circuit potential, and fill factor of the n-SiNW arrays have been explored using a liquid-junction in a photoelectrochemical (PEC) system under white light. Moreover, a direct comparison between the PEC performance of a polished n-Si(100) and the synthesized n-SiNW array photoelectrodes has been done. The PEC performance was significantly enhanced on the n-SiNWs photoelectrodes compared with that on polished n-Si(100).

  19. Eighth workshop on crystalline silicon solar cell materials and processes: Extended abstracts and papers

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1998-08-01

    The theme of this workshop is Supporting the Transition to World Class Manufacturing. This workshop provides a forum for an informal exchange of information between researchers in the photovoltaic and non-photovoltaic fields on various aspects of impurities and defects in silicon, their dynamics during device processing, and their application in defect engineering. This interaction helps establish a knowledge base that can be used for improving device fabrication processes to enhance solar-cell performance and reduce cell costs. It also provides an excellent opportunity for researchers from industry and universities to recognize mutual needs for future joint research. The workshop format features invited review presentations, panel discussions, and two poster sessions. The poster sessions create an opportunity for both university and industrial researchers to present their latest results and provide a natural forum for extended discussions and technical exchanges.

  20. Influence of the impurity-defect and impurity-impurity interactions on the crystalline silicon solar cells conversion efficiency; Influence des interactions impurete-defaut et impurete-impurete sur le rendement de conversion des cellules photovoltaiques au silicium cristallin

    Energy Technology Data Exchange (ETDEWEB)

    Dubois, S

    2007-05-15

    This study aims at understanding the influence of the impurity - defect interaction on the silicon solar cell performances. We studied first the case of single-crystalline silicon. We combined numerical simulations and experimental data providing new knowledge concerning metal impurities in silicon, to quantify the evolution of the conversion efficiency with the impurity concentration. Mainly due to the gettering effects, iron appears to be quite well tolerated. It is not the case for gold, diffusing too slowly. Hydrogenation effects were limited. We transposed then this study toward multi-crystalline silicon. Iron seems rather well tolerated, due to the gettering effects but also due to the efficiency of the hydrogenation. When slow diffusers are present, multi crystalline silicon is sensitive to thermal degradation. n-type silicon could solve this problem, this material being less sensitive to metal impurities. (author)

  1. Sequential C-Si Bond Formations from Diphenylsilane: Application to Silanediol Peptide Isostere Precursors

    DEFF Research Database (Denmark)

    Nielsen, Lone; Skrydstrup, Troels

    2008-01-01

    and the first new carbon-silicon bond. The next step is the reduction of this hydridosilane with lithium metal providing a silyl lithium reagent, which undergoes a highly diastereoselective addition to an optically active tert-butanesulfinimine, thus generating the second C-Si bond. This method allows......-step assembly of the carbon-silicon backbone of a silane-containing dipeptide fragment. The synthetic scheme is comprised of an alkene hydrosilylation step with the simple precursor, diphenylsilane, using either a radical initiator or RhCl(PPh3)3, Wilkinson's catalyst, for the creation of a hydridosilane...

  2. Characterization of a-Si:H/c-Si Heterojunctions by Time Resolved Microwave Conductivity Technique

    Directory of Open Access Journals (Sweden)

    Amornrat Limmanee

    2014-01-01

    Full Text Available In heterojunction solar cells, a-Si:H/c-Si heterointerface is of significant importance, since the heterointerface characteristics directly affect junction properties and thus solar cell efficiency. In this study, we have performed time resolved microwave conductivity (TRMC measurements on n-type c-Si wafers passivated on both sides with intrinsic and doped a-Si:H layers in order to investigate electrical property and passivation quality of the a-Si:H/c-Si heterojunctions. It was found that the TRMC decay time and decay curve shape varied with the laser wavelength and power intensity and also depended on sample structures. By using 1064 nm laser pulse with high excitation, differences in the decay curve shape between samples with and without p-n junction were observed. The samples containing p-n junction(s had unique slow decay mode, after the initial fast decay, which we ascribed to the release of carriers from the low-mobility amorphous layer into the high-mobility crystalline wafer as the built-in field of the junction was restored. Experimental results suggest that the TRMC is useful nondestructive technique which is suitable for primary check of the a-Si:H/c-Si heterojunctions during the solar cell fabrication process.

  3. Electron spin resonance and transient photocurrent measurements on microcrystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Dylla, T.

    2004-09-01

    The electronic properties of microcrystalline silicon ({mu}c-Si:H) films have been studied using electron spin resonance (ESR), transient photocurrent time-of-flight (TOF) techniques, and electrical conductivity measurements. Structural properties were determined by Raman spectroscopy. A wide range of structure compositions, from highly crystalline films with no discernable amorphous content, to predominantly amorphous films with no crystalline phase contributions, was investigated. Models and possible explanations concerning the nature and energetic distribution of electronic defects as a function of film composition are discussed. It is shown that the spin density N{sub S} in {mu}c-Si:H films is linked strongly to the structure composition of the material. Both reversible and irreversible changes in the ESR signal and dark conductivity due to atmospheric effects are found in {mu}c-Si:H. The porous structure of highly crystalline material facilitates in-diffusion of atmospheric gases, which strongly affects the character and/or density of surface states. Two contributing processes have been identified, namely adsorption and oxidation. Both processes lead to an increase of N{sub S}. Measurements on n-type {mu}c-Si:H films were used as a probe of the density of gap states, confirming that the spin density NS is related to the density of defects. The results confirm that for a wide range of structural compositions, the doping induced Fermi level shift in {mu}c-Si:H is governed by compensation of defect states, for doping concentrations up to the dangling bond spin density. At higher concentrations a doping efficiency close to unity was found, confirming that in {mu}c-Si:H the measured spin densities represent the majority of gap states (N{sub S}=N{sub DB}). By applying the TOF technique to study pin solar cells based on {mu}c-Si:H, conclusive hole drift mobility data were obtained. Despite the predominant crystallinity of these samples, the temperature-dependence of

  4. Ion beam synthesis and characterization of large area 3C-SiC pseudo substrates for homo- and heteroepitaxy; Ionenstrahlsynthese und Charakterisierung grossflaechiger 3C-SiC-Pseudosubstrate fuer die Homo- und Heteroepitaxie

    Energy Technology Data Exchange (ETDEWEB)

    Haeberlen, Maik

    2006-12-15

    In this work, large area epitaxial 3C-SiC films on Si(100) and Si(111) were formed by ion beam synthesis and subsequently characterized for their structural and crystalline properties. These SiC/Si structures are meant to be used as SiC pseudosubstrates for the homo- and heteroepitaxial growth of other compound semiconductors. The suitability of these pseudosubstrates for this purpose was tested using various epitaxial systems and thin film growth methods. For this the homoepitaxial growth of 3C-SiC employing C{sub 60}-MBE and the heteroepitaxial growth of hexagonal GaN films grown by MOCVD and IBAMBA was studied in detail. The comparison of the structural and crystalline properties with data from literature enabled a qualified judgement of the potential of the 3C-SiC pseudosubstrates as an alternative substrate for the epitaxial growth of such films. These new 3C-SiC pseudosubstrates also enabled studies of other little known epitaxial systems: For the first time hexagonal ZnO films on (111) oriented pseudosubstrates were grown using PLD. The method if IBAMBE enabled the growth of cubic GaN layers on (100)-oriented pseudosubstrates. (orig.)

  5. Tribological characteristics of C/C-SiC braking composites under dry and wet conditions

    Institute of Scientific and Technical Information of China (English)

    LI Zhuan; XIAO Peng; XIONG Xiang; ZHU Su-hua

    2008-01-01

    C/C-SiC braking composites, based on reinforcement of carbon fibers and rnatrices of carbon and silicon carbide, were fabricated by warm compaction and in situ reaction process. The tribological characteristics of C/C-SiC braking composites under dry and wet conditions were investigated by means of MM-1000 type of friction testing machine. The influence of dry and wet conditions on the tribological characteristics of the C/C-SiC composites was ascertained. Under dry condition, C/C-SiC braking composites show superior tribological characteristics, including high coefficient of friction (0.38), good abrasive resistance (thickness loss is 1.10 μm per cycle) and steady breaking. The main wear mechanism is plastic deformation and abrasion caused by plough. Under wet condition, frictional films form on the worn surface. The coefficient of friction (0.35) could maintain mostly, and the thickness loss (0.70 μm per cycle) reduces to a certain extent. Furthermore, braking curves are steady and adhesion and oxidation are the main wear mechanisms.

  6. Behaviors of hydrogen in C-SiC films with IR and SIMS analyses

    CERN Document Server

    Huang, N K; Xiong, Q; Liu, Y G; Wang, D Z; Lei, J R

    2002-01-01

    C-SiC films with different content of SiC were prepared with magnetron sputtering deposition followed by Ar sup + ion bombardment. Secondary ion mass spectroscopy depth profiles of hydrogen for the samples of C-SiC coated stainless steel and stainless steel substrate after H sup + ion implantation and thermal annealing show different hydrogen concentrations in C-SiC coatings and stainless steel. Infrared (IR) transmission measurement was selected to study the mechanism of hydrogen retention by C-SiC films. The vibrational spectra in the range between 400 and 3200 cm sup - sup 1 in IR transmission spectra show the Si-CH sub 3 , Si-CH sub 2 , Si-H, CH sub 2 , CH sub 3 etc. bonds, which are responsible for retaining hydrogen. Apart from the mode above, there also exist bonds related to carbon and silicon such as Si-C, C=C. The contamination of oxygen entered the film to form C=O and SiO sub 2 configurations and hydrogen contamination also formed Si-CH sub 2 mode in the films.

  7. STRUCTURAL PROPERTIES INVESTIGATION ON MICROCRYSTALLINE SILICON FILMS DEPOSITED WITH VHF-PECVD TECHNIQUE

    Institute of Scientific and Technical Information of China (English)

    H.D. Yang

    2005-01-01

    Raman scattering spectroscopy and scanning electron microscopy (SEM) techniques were used to determine the structural properties of two typical series of microcrystalline silicon(μc-Si:H) films deposited at different VHF plasma power and different working gas pressure by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique. Raman spectra measurements show that both crystalline volume fraction Xc and average grain size d of μc-Si: H films are strongly affected by the two deposition conditions and are more sensitive to working gas pressure than VHF plasma power. SEM characterizations have further confirmed that VHF plasma power and working gas pressure could clearly enhance the surface roughness of μc-Si: H films ascribing to polymerization reactions, which is also more sensitive to working gas pressure than VHF plasma power.

  8. Copper conducting electrode with nickel as a seed layer for selective emitter crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Rehman, Atteq ur; Shin, Eun Gu; Lee, Soo Hong [Sejong University, Seoul (Korea, Republic of)

    2014-09-15

    In this research, we investigated selective emitter formation with a single-step photolithography process having a metallization scheme composed of nickel/copper metal stacks. The nickel seed layers were deposited by applying the electroless deposition process while copper was formed by light induced electro-plating arrangements as the main conducting electrode. The electroless deposition of nickel, along with a sintering process, was employed to create a diffusion barrier between copper and silicon. The nickel metal stack below the copper-conducting electrode also helped in lowering the sheet resistance and improving the contact adhesion. The nickel used as a seed layer was successfully demonstrated in the fabrication of a homogeneous 60 Ω/ emitter and selective emitter cells. Lower series resistances of 0.165 Ω and 0.253 Ω were achieved for the selective emitter and the homogeneous emitter cells, respectively. The best cell efficiency of 18.37% for the selective emitter solar cell was achieved, with average cell efficiencies of 18.17% and 17.3% for the selective emitter and the homogeneous emitter cells, respectively. An approximate efficiency increase of about 0.8% was recorded for the selective emitter solar cells.

  9. Recycling WEEE: Polymer characterization and pyrolysis study for waste of crystalline silicon photovoltaic modules.

    Science.gov (United States)

    Dias, Pablo; Javimczik, Selene; Benevit, Mariana; Veit, Hugo

    2017-02-01

    Photovoltaic (PV) modules contain both valuable and hazardous materials, which makes its recycling meaningful economically and environmentally. In general, the recycling of PV modules starts with the removal of the polymeric ethylene-vinyl acetate (EVA) resin using pyrolysis, which assists in the recovery of materials such as silicon, copper and silver. The pyrolysis implementation, however, needs improvement given its importance. In this study, the polymers in the PV modules were characterized by Fourier transform infrared spectroscopy (FTIR) and the removal of the EVA resin using pyrolysis has been studied and optimized. The results revealed that 30min pyrolysis at 500°C removes >99% of the polymers present in photovoltaic modules. Moreover, the behavior of different particle size milled modules during the pyrolysis process was evaluated. It is shown that polymeric materials tend to remain at a larger particle size and thus, this fraction has the greatest mass loss during pyrolysis. A thermo gravimetric analysis (TGA) performed in all polymeric matter revealed the optimum pyrolysis temperature is around 500°C. Temperatures above 500°C continue to degrade matter, but mass loss rate is 6.25 times smaller. This study demonstrates the use of pyrolysis can remove >99% of the polymeric matter from PV modules, which assists the recycling of this hazardous waste and avoids its disposal. Copyright © 2016 Elsevier Ltd. All rights reserved.

  10. A field-emission pressure sensor of nano-crystalline silicon film

    Institute of Scientific and Technical Information of China (English)

    廖波; 韩建保

    2001-01-01

    The prototype of a field-emission pressure sensor with a novel structure based on the quantum tunnel effect is designed and manufactured, where a cathode emitter array is fabricated on the same silicon plate as the sensible film. For an integrated structure, not only the alignment and vacuum bonding between the anode and cathode are easy to be realized, but also a fine sensibility is guaranteed. For example, the measured current density emitted from the effective area of the sensor can reach 53.5 A/m2 when the exterior electric field is 5.6 x 105 V/m. Furthermore, it is demonstrated by finite element method simulation that the reduction in sensor sensitivity caused by emitters on the sensible film is negligible. The difference between the maximum deflections of the sensible films with and without emitters under specified pressure is less than 0.4 %. Therefore, it can be concluded that the novel field-emission sensor structure is reasonable.

  11. Planarization process of single crystalline silicon asperity under abrasive rolling effect studied by molecular dynamics simulation

    Energy Technology Data Exchange (ETDEWEB)

    Si, Lina [Tsinghua University, State Key Laboratory of Tribology, Beijing (China); Beijing Institute of Technology, School of Mechanical Engineering, Beijing (China); Guo, Dan; Luo, Jianbin; Xie, Guoxin [Tsinghua University, State Key Laboratory of Tribology, Beijing (China)

    2012-10-15

    In the chemical mechanical polishing (CMP) process, the complex behaviors of abrasive particles play important roles in the planarization of wafer surface. Particles embedded in the pad remove materials by ploughing, while particles immersed in the slurry by rolling across the wafer surface. In this paper, processes of the particle rolling across a silicon surface with an asperity under various down forces and external driving forces were studied using molecular dynamics (MD) simulation method. The simulations clarified the asperity shape evolution during the rolling process and analyzed the energy changes of the simulation system and the interaction forces acted on the silica particle. It was shown that both the down force and the driving force had important influences on the amount of the material removed. With relatively small down forces and driving forces applied on the particle, the material removal occurred mainly in the front end of the asperity; when the down forces and driving forces were large enough, e.g., 100 nN, the material removal could take place at the whole top part of the asperity. The analysis of energy changes and interaction forces provided favorable explanations to the simulation results. (orig.)

  12. A Multi-Criterion Analysis of Cross-Strait Co-Opetitive Strategy in the Crystalline Silicon Solar Cell Industry

    Directory of Open Access Journals (Sweden)

    Hsiao-Chi Chen

    2014-01-01

    Full Text Available The research adopts multi-criterion analysis to face cross-strait cooperative and competitive (co-opetitive strategies problem in the crystalline silicon solar cell industry between Taiwan and China. The analysis framework is based on the national competitiveness. The Analytical Hierarchy Process (AHP approach and TOPSIS analysis are applied to analyze firm-level data, gathered from the solar cell companies across the Taiwan Strait. For the Taiwanese firms, their relative national competitiveness lies in technology development, domestic market, international competition in related industries, and subsidy policy. For the Chinese firms, domestic market, procurement conditions, customization, intellectual resources, risk capital, and human quality are found to be their competitive advantages. Both China and Taiwan have entered into the emerging solar cell industry, with an aim to climb beyond the ladder of catch up. The results have shown that Taiwan and China can explore the possibility of forging strategic alliances by exploiting national competitiveness on the demand side. Above all, the paper has managed to spotlight demand conditions as the crucial factors for China and Taiwan to enhance their international competitiveness in the emerging solar cell industry.

  13. Improving Crystalline Silicon Solar Cell Efficiency Using Graded-Refractive-Index SiON/ZnO Nanostructures

    Directory of Open Access Journals (Sweden)

    Yung-Chun Tu

    2015-01-01

    Full Text Available The fabrication of silicon oxynitride (SiON/ZnO nanotube (NT arrays and their application in improving the energy conversion efficiency (η of crystalline Si-based solar cells (SCs are reported. The SiON/ZnO NT arrays have a graded-refractive-index that varies from 3.5 (Si to 1.9~2.0 (Si3N4 and ZnO to 1.72~1.75 (SiON to 1 (air. Experimental results show that the use of 0.4 μm long ZnO NT arrays coated with a 150 nm thick SiON film increases Δη/η by 39.2% under AM 1.5 G (100 mW/cm2 illumination as compared to that of regular SCs with a Si3N4/micropyramid surface. This enhancement can be attributed to SiON/ZnO NT arrays effectively releasing surface reflection and minimizing Fresnel loss.

  14. Biomimetic spiral grating for stable and highly efficient absorption in crystalline silicon thin-film solar cells

    KAUST Repository

    Hou, Jin

    2017-09-12

    By emulating the phyllotaxis structure of natural plants, which has an efficient and stable light capture capability, a two-dimensional spiral grating is introduced on the surface of crystalline silicon solar cells to obtain both efficient and stable light absorption. Using the rigorous coupled wave analysis method, the absorption performance on structural parameter variations of spiral gratings is investigated firstly. Owing to diffraction resonance and excellent superficies antireflection, the integrated absorption of the optimal spiral grating cell is raised by about 77 percent compared with the conventional slab cell. Moreover, though a 15 percent deviation of structural parameters from the optimal spiral grating is applied, only a 5 percent decrease of the absorption is observed. This reveals that the performance of the proposed grating would tolerate large structural variations. Furthermore, the angular and polarization dependence on the absorption of the optimized cell is studied. For average polarizations, a small decrease of only 11 percent from the maximum absorption is observed within an incident angle ranging from −70 to 70 degrees. The results show promising application potentials of the biomimetic spiral grating in the solar cell.

  15. Means of Improvement the Efficiency of Concentrator Crystalline Silicon Solar Cells%提高聚光单晶硅太阳电池效率的途径

    Institute of Scientific and Technical Information of China (English)

    张燎; 金文进; 薛岩

    2012-01-01

    聚光太阳能电池具有效率高、成本低等优势。从电池结构出发,着重总结了背面点接触结构、双面陷光、双面钝化、减薄电池厚度和减小发射区饱和电流密度等新技术措施对提高聚光晶体硅电池效率的重要性和优势,同时也指出了现有工艺存在的问题,最后展望了聚光单晶硅太阳能电池工艺发展的可能方向。特别指出:聚光单晶硅电池效率大幅度提高将是硅电池结构设计理论和制备工艺的的重大突破.%Concentrator solar cells have good prospects for superiority of high efficiency and low cost.This review summarizes the importance and advantages of improvement the conversion efficiency of concentrator crystalline silicon solar cells,especially focuses on the structure of back-surface point contact,double-sided light trapping,double-sided anti-reflection with double-sided passivation,thinning the thickness of the cells and reduces the emitter saturation current density and other new technology initiatives.These measures have high value to promote efficiency and decrease costs of the concentrator crystalline silicon solar cells.And it points out that the existing process problems and the possible direction of technology development.Finally,prospects on concentrator crystalline silicon solar cells are discussed,and a major breakthrough of design theory and preparation process is predicted for substantial improvement the conversion efficiency of concentrator crystalline silicon solar cells.

  16. Factors limiting the open-circuit voltage in microcrystalline silicon solar cells

    Directory of Open Access Journals (Sweden)

    Chatterjee P.

    2011-11-01

    Full Text Available In studying photovoltaic devices made with silicon thin films and considering them according to their grain size, it is curious that as the crystalline fraction increases, the open-circuit voltage (Voc – rather than approaching that of the single-crystal case – shows a decline. To gain an insight into this behavior, observed in hydrogenated microcrystalline siliconc-Si:H solar cells prepared under a variety of deposition conditions, we have used a detailed electrical-optical computer modeling program, ASDMP. Two typical μc-Si:H cells with low (~79% and higher (~93% crystalline volume fractions (Fc, deposited in our laboratory and showing this general trend, were modeled. From the parameters extracted by simulation of their experimental current density – voltage and quantum efficiency characteristics, it was inferred that the higher Fc cell has both a higher band gap defect density as well as a lower band gap energy. Our calculations reveal that the proximity of the quasi-Fermi levels to the energy bands in cells based on highly crystallized μc-Si:H (assumed to have a lower band gap, results in both higher free and trapped carrier densities. The trapped hole population, that is particularly high near the P/I interface, results in a strong interface field, a collapse of the field in the volume, and hence a lower open-circuit voltage. Interestingly enough, we were able to fabricate fluorinated μc-Si:H:F cells having 100% crystalline fraction as well as very large grains, that violate the general trend and show a higher Voc. Modeling indicates that this is possible for the latter case, as also for a crystalline silicon PN cell, in spite of a sharply reduced band gap, because the lower effective density of states at the band edges and a sharply reduced gap defect density overcome the effect of the lower band gap.

  17. Desenvolvimento de sistemas líquido-cristalinos empregando silicone fluido de co-polímero glicol e poliéter funcional siloxano Development of liquid-crystalline systems using silicon glycol copolymer and polyether functional siloxane

    Directory of Open Access Journals (Sweden)

    Marlus Chorilli

    2009-01-01

    Full Text Available For the construction of the phase diagrams, the method of the aqueous titration was used. There were prepared 5 ternary diagrams, varying the surfactant and the oil phase. The liquid-crystalline phases were identified by polarized light microscopy. The formulations prepared with silicon glycol copolymer, polyether functional siloxane (PFS and water (S1 and with diisopropyl adipate, PFS and water (S4 presented liquid-crystalline phases with lamellar arrangement. Moreover, after 15 days in hot oven (37 ºC, the formulations presented hexagonal arrangement, evidencing the influence of the temperature in the organization of the system.

  18. Fracture Characteristics of C/SiC Composites for Rocket Nozzle at Elevated Temperature

    Energy Technology Data Exchange (ETDEWEB)

    Yoon, Dong Hyun; Lee, Jeong Won; Kim, Jae Hoon [Chungnam Nat’l Univ., Daejeon (Korea, Republic of); Sihn, Ihn Cheol; Lim, Byung Joo [Dai-Yang Industries Co., Daejeon (Korea, Republic of)

    2016-11-15

    In a solid propulsion system, the rocket nozzle is exposed to high temperature combustion gas. Hence, choosing an appropriate material that could demonstrate adequate performance at high temperature is important. As advanced materials, carbon/silicon carbide composites (C/SiC) have been studied with the aim of using them for the rocket nozzle throat. However, when compared with typical structural materials, C/SiC composites are relatively weak in terms of both strength and toughness, owing to their quasi-brittle behavior and oxidation at high temperatures. Therefore, it is important to evaluate the thermal and mechanical properties of this material before using it in this application. This study presents an experimental method to investigate the fracture behavior of C/SiC composite material manufactured using liquid silicon infiltration (LSI) method at elevated temperatures. In particular, the effects of major parameters, such as temperature, loading, oxidation conditions, and fiber direction on strength and fracture characteristics were investigated. Fractography analysis of the fractured specimens was performed using an SEM.

  19. Investigation of charges carrier density in phosphorus and boron doped SiN{sub x}:H layers for crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Paviet-Salomon, B., E-mail: bertrand.paviet-salomon@epfl.ch [Commissariat à l’Énergie Atomique (CEA), Laboratoire d’Innovation pour les Technologies des Énergies Nouvelles et les nanomatériaux (LITEN), Institut National de l’Énergie Solaire - INES, 50 avenue du Lac Léman, 73377 Le Bourget du Lac (France); Gall, S. [Commissariat à l’Énergie Atomique (CEA), Laboratoire d’Innovation pour les Technologies des Énergies Nouvelles et les nanomatériaux (LITEN), Institut National de l’Énergie Solaire - INES, 50 avenue du Lac Léman, 73377 Le Bourget du Lac (France); Slaoui, A. [Institut de l’Électronique du Solide et des Systèmes (InESS), Unité Mixte de Recherche 7163 Centre National de la Recherche Scientifique-Université de Strasbourg (UMR 7163 CNRS-UDS), 23 rue du Loess, BP 20 CR, 67037 Strasbourg (France)

    2013-05-15

    Highlights: ► We investigate the properties of phosphorus and boron-doped silicon nitride films. ► Phosphorus-doped layers yield higher lifetimes than undoped ones. ► The fixed charges density decreases when increasing the films phosphorus content. ► Boron-doped films feature very low lifetimes. ► These doped layers are of particular interest for crystalline silicon solar cells. -- Abstract: Dielectric layers are of major importance in crystalline silicon solar cells processing, especially as anti-reflection coatings and for surface passivation purposes. In this paper we investigate the fixed charge densities (Q{sub fix}) and the effective lifetimes (τ{sub eff}) of phosphorus (P) and boron (B) doped silicon nitride layers deposited by plasma-enhanced chemical vapour deposition. P-doped layers exhibit a higher τ{sub eff} than standard undoped layers. In contrast, B-doped layers exhibit lower τ{sub eff}. A strong Q{sub fix} decrease is to be seen when increasing the P content within the film. Based on numerical simulations we also demonstrate that the passivation obtained with P- and B-doped layers are limited by the interface states rather than by the fixed charges.

  20. Role of oxygen and nitrogen in n-type microcrystalline silicon carbide grown by hot wire chemical vapor deposition

    Science.gov (United States)

    Pomaska, Manuel; Mock, Jan; Köhler, Florian; Zastrow, Uwe; Perani, Martina; Astakhov, Oleksandr; Cavalcoli, Daniela; Carius, Reinhard; Finger, Friedhelm; Ding, Kaining

    2016-12-01

    N-type microcrystalline silicon carbide (μc-SiC:H(n)) deposited by hot wire chemical vapor deposition provides advantageous opto-electronic properties for window layer material in silicon-based thin-film solar cells and silicon heterojunction solar cells. So far, it is known that the dark conductivity (σd) increases with the increase in the crystallinity of μc-SiC:H(n)films. However, due to the fact that no active doping source is used, the mechanism of electrical transport in these films is still under debate. It is suggested that unintentional doping by atmospheric oxygen (O) or nitrogen (N) contamination plays an important role in the electrical transport. To investigate the impact of O and N, we incorporated O and N in μc-SiC:H(n) films and compared the influence on the microstructural, electronic, and optical properties. We discovered that, in addition to increasing the crystallinity, it is also possible to increase the σd by several orders of magnitude by increasing the O-concentration or the N-concentration in the films. Combining a high concentration of O and N, along with a high crystallinity in the film, we optimized the σd to a maximum of 5 S/cm.

  1. Technology development of the nano-crystalline silicon thin film materials%纳米晶硅薄膜材料的技术发展

    Institute of Scientific and Technical Information of China (English)

    吴大维; 吴越侠; 唐志斌

    2012-01-01

    The recent development of the nano - crystalline silicon thin film material is reviewed in this paper. Some ideas is proposed to promote advances of the silicon thin film solar cells. In this paper, we make come discussions on the development of silicon thin film solar cells and predict the prospect of latest ones.%本文综述了硅基薄膜材料的发展历程;提出了一些促进硅基薄膜电池技术进步的思路;并对硅 基薄膜电池的发展进行了有益的探讨,对最新的硅基薄膜太阳能电池作了展望.

  2. Effects of the gas feeding method on the properties of 3C-SiC/Si(111) grown by rapid thermal chemical vapor deposition

    CERN Document Server

    Shim, H W; Suh, E K

    1998-01-01

    High-quality crystalline 3C-SiC thin films are grown by rapid thermal chemical vapor deposition (RTCVD) on Si(111) by using two different growth processes. The films are grown along the [111] direction at 1200 .deg. C. The quality of the films are investigated by X-ray diffraction, transmission electron microscopy, and transmission electron diffraction. The SiC film grown by flowing the tetramethylsilane (TMS) gas before heating the substrate up to the growth temperature does not contain many voids at the SiC/Si interface, while the SiC grown by heating the substrate before supplying the TMS gas possesses many voids at the interface. The unintentionally doped SiC film grown by gas flow before heating the substrate appears to be n-type with a carrier concentration of 1.48 x 10 sup 1 sup 6 cm sup - sup 3 , a electron mobility of 884 cm sup 2 /V centre dot s, and a resistivity of 0.462 OMEGA centre dot cm. The physical properties, such as the electrical properties, the surface morphology, and the crystallinity, ...

  3. Electronic structure of the amorphous-crystalline Silicon heterostructure contact; Die elektronische Struktur des amorph-kristallinen Silizium-Heterostruktur-Kontakts

    Energy Technology Data Exchange (ETDEWEB)

    Korte, L.

    2006-07-01

    In the present work, the electronic density of states of hydrogenated amorphous silicon (a-Si:H) layers in the thickness range from 300 down to {proportional_to}2 nm was examined by Near-UV-photoelectron spectroscopy (NUV-PES). The measurements yield a mean density (averaged over all directions in k space) of the extended states in the valence band close to the band edge E{sub v}, down to approximately E{sub v}-1 eV, as well as the density of states in the band-gap between E{sub v} and the Fermi level E{sub f}. An analytic model for the density of states was fitted to the measured yield data. The model describes the extended states close to the band edge as well as the localized states in the band gap. The defect parameters obtained from the fits to the 300 nm sample are elevated with respect to literature data. In contrast to PES the photocurrent measurement yield the defect parameters averaged over the entire layer thickness. Finally, the photocurrent measurements can be evaluated in the Tauc plot to yield the optical band-gap, E{sub g}{sup opt}=1.76(5) eV. The methodology developed in the first part of the thesis (PES measurement and fit of the model density of states) was then applied to various series of approximately 10 nm thin a-Si:H layers on c-Si substrates, where the deposition temperature of the layers and the concentration of their doping both by phosphorus and boron were varied. The experimental results can be summarized as follows: Ultrathin a-Si:H layers show an optimum of the deposition-temperature around 230 C. The optimum is characterized by an Urbach energy of 66(1) meV and a defect-density of 2,9(3).10{sup 18} cm{sup -3}. For undoped layers, the Fermi level lies E{sub F}-E{sub V}{sup {mu}}=1.04(6) eV, the films are therefore slightly n-type. Conductivity measurements at identically prepared thick layers on glass allow to determine the distance of the Fermi level to the conduction band mobility edge, E{sub C}{sup {mu}}-E{sub F}. Both for the

  4. Characterization of SiC-SiC composites for accident tolerant fuel cladding

    Science.gov (United States)

    Deck, C. P.; Jacobsen, G. M.; Sheeder, J.; Gutierrez, O.; Zhang, J.; Stone, J.; Khalifa, H. E.; Back, C. A.

    2015-11-01

    Silicon carbide (SiC) is being investigated for accident tolerant fuel cladding applications due to its high temperature strength, exceptional stability under irradiation, and reduced oxidation compared to Zircaloy under accident conditions. An engineered cladding design combining monolithic SiC and SiC-SiC composite layers could offer a tough, hermetic structure to provide improved performance and safety, with a failure rate comparable to current Zircaloy cladding. Modeling and design efforts require a thorough understanding of the properties and structure of SiC-based cladding. Furthermore, both fabrication and characterization of long, thin-walled SiC-SiC tubes to meet application requirements are challenging. In this work, mechanical and thermal properties of unirradiated, as-fabricated SiC-based cladding structures were measured, and permeability and dimensional control were assessed. In order to account for the tubular geometry of the cladding designs, development and modification of several characterization methods were required.

  5. Effects of neutral particle beam on nano-crystalline silicon thin films, with application to thin film transistor backplane for flexible active matrix organic light emitting diodes

    Energy Technology Data Exchange (ETDEWEB)

    Jang, Jin Nyoung; Song, Byoung Chul; Lee, Dong Hyeok [Dept. of Display and Semiconductor Physics, Korea University, Chungnam (Korea, Republic of); Yoo, Suk Jae; Lee, Bonju [National Fusion Research Institute, 52, Yuseong-Gu, Deajeon, 305-333 (Korea, Republic of); Hong, MunPyo, E-mail: goodmoon@korea.ac.kr [Dept. of Display and Semiconductor Physics, Korea University, Chungnam (Korea, Republic of)

    2011-08-01

    A novel deposition process for nano-crystalline silicon (nc-Si) thin films was developed using neutral beam assisted chemical vapor deposition (NBaCVD) technology for the application of the thin film transistor (TFT) backplane of flexible active matrix organic light emitting diode (AMOLED). During the formation of a nc-Si thin film, the energetic particles enhance nano-sized crystalline rather microcrystalline Si in thin films. Neutral Particle Beam (NPB) affects the crystallinity in two ways: (1) NPB energy enhances nano-crystallinity through kinetic energy transfer and chemical annealing, and (2) heavier NPB (such as Ar) induces damage and amorphization through energetic particle impinging. Nc-Si thin film properties effectively can be changed by the reflector bias. As increase of NPB energy limits growing the crystalline, the performance of TFT supports this NPB behavior. The results of nc-Si TFT by NBaCVD demonstrate the technical potentials of neutral beam based processes for achieving high stability and reduced leakage in TFT backplanes for AMOLEDs.

  6. Development of Hydrogenated Microcrystalline Silicon-Germanium Alloys for Improving Long-Wavelength Absorption in Si-Based Thin-Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Yen-Tang Huang

    2014-01-01

    Full Text Available Hydrogenated microcrystalline silicon-germanium (μc-Si1-xGex:H alloys were developed for application in Si-based thin-film solar cells. The effects of the germane concentration (RGeH4 and the hydrogen ratio (RH2 on the μc-Si1-xGex:H alloys and the corresponding single-junction thin-film solar cells were studied. The behaviors of Ge incorporation in a-Si1-xGex:H and μc-Si1-xGex:H were also compared. Similar to a-Si1-xGex:H, the preferential Ge incorporation was observed in μc-Si1-xGex:H. Moreover, a higher RH2 significantly promoted Ge incorporation for a-Si1-xGex:H, while the Ge content was not affected by RH2 in μc-Si1-xGex:H growth. Furthermore, to eliminate the crystallization effect, the 0.9 μm thick absorbers with a similar crystalline volume fraction were applied. With the increasing RGeH4, the accompanied increase in Ge content of μc-Si1-xGex:H narrowed the bandgap and markedly enhanced the long-wavelength absorption. However, the bias-dependent EQE measurement revealed that too much Ge incorporation in absorber deteriorated carrier collection and cell performance. With the optimization of RH2 and RGeH4, the single-junction μc-Si1-xGex:H cell achieved an efficiency of 5.48%, corresponding to the crystalline volume fraction of 50.5% and Ge content of 13.2 at.%. Compared to μc-Si:H cell, the external quantum efficiency at 800 nm had a relative increase by 33.1%.

  7. High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Hydrogenated microcrystalline siliconc-Si:H) thin films were prepared by high- pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition rate and crystallinity varying with the deposition pressure, rf power, hydrogen dilution ratio and electrodes distance were systematically studied. By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 /s at a high pressure. The Voc of 560 mV and the FF of 0.70 have been achieved for a single-junction μc-Si:H p-i-n solar cell at a deposition rate of 7.8 /s.

  8. Intermittent Very High Frequency Plasma Deposition on Microcrystalline Silicon Solar Cells Enabling High Conversion Efficiency

    Directory of Open Access Journals (Sweden)

    Mitsuoki Hishida

    2016-01-01

    Full Text Available Stopping the plasma-enhanced chemical vapor deposition (PECVD once and maintaining the film in a vacuum for 30 s were performed. This was done several times during the formation of a film of i-layer microcrystalline siliconc-Si:H used in thin-film silicon tandem solar cells. This process aimed to reduce defect regions which occur due to collision with neighboring grains as the film becomes thicker. As a result, high crystallinity (Xc of μc-Si:H was obtained. Eventually, a solar cell using this process improved the conversion efficiency by 1.3% (0.14 points, compared with a normal-condition cell. In this paper, we propose an easy method to improve the conversion efficiency with PECVD.

  9. Investigation of an a-Si/c-Si interface on a c-Si(P) substrate by simulation

    Institute of Scientific and Technical Information of China (English)

    Wang Jianqiang; Gao Hua; Zhang Jian; Meng Fanying; Ye Qinghao

    2012-01-01

    We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Qs,δp/δn and Dit.The polarity of the dielectric film is very important to the illustration level dependent passivation quality; when nδn =pδp and the defect level Et equal to Ei (c-Si),the defect states are the most effective recombination center,AFORS-HET simulation and analysis indicate that emitter doping and a-Si/c-Si band offset modulation are effective in depleting or accumulating one charged carrier.Interface states (Dit) severely deteriorate Voc compared with Jsc for a-Si/c-Si HJ cell performance when Dit is over 1 × 1010 cm-2.eV-1.For a c-Si(P)/a-Si(P+) structure,ΦBSF in c-Si and Φo in a-Si have different performances in optimization contact resistance and c-Si(P)/a-Si(P+) interface recombination.

  10. C-SiC Honeycomb for Advanced Flight Structures Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The proposed project is to manufacture a C-SiC honeycomb structure to use as a high temperature material in advanced aircraft, spacecraft and industrial...

  11. Low-Frequency Noise and Microplasma Analysis for c-Si Solar Cell Characterization

    Directory of Open Access Journals (Sweden)

    Jiří Vanek

    2012-01-01

    Full Text Available This paper brings the comparison of solar cell conversion efficiency and results from a noise spectroscopy and microplasma presence to evaluate the solar cell technology. Three sets of monocrystalline silicon solar cells (c-Si varying in front side phosphorus doped emitters were produced by standard screen-printing technique. From the measurements it follows that the noise spectral density related to defects is of 1/f type and its magnitude. It has been established that samples showing low noise feature high-conversion efficiency. The best results were reached for a group solar cells with selective emitter structure prepared by double-phosphorus diffusion process.

  12. Investigation of the optoelectronic properties of {mu}c-Si:H pin solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Stiebig, H.; Brammer, T.; Zimmer, J.; Vetterl, O.; Wagner, H. [Forschungszentrum Juelich GmbH, ISI-PV, D-52425 Juelich (Germany)

    2000-05-01

    We have investigated microcrystalline silicon ({mu}c-Si:H) pin solar cells deposited at different silane concentrations in the gas phase varying from 2% to 7.2%. For these cells three features were found: the dark current of the cells decreased, the open circuit voltage increased and the blue response reduced with increasing silane concentration during deposition. To study the transport and recombination of these structures we have compared the experimentally determined optoelectronic properties with simulated data. The simulations reveal that the equilibrium carrier concentration of free carriers decreases and the affect of the nucleation region of the i-layer on the blue response increases with increasing silane concentration.

  13. ELECTRONIC STRUCTURE OF CLUSTER ASSEMBLED Al12C (Si) SOLID

    Institute of Scientific and Technical Information of China (English)

    QUAN HONG-JUN; GONG XIN-GAO

    2000-01-01

    The electronic structures of the cluster-assembled solid Al12C (Si) are studied by the ab initio method. We find that Al12C (Si) can solidify into a van der Waals solid. The electronic band structures show very weak dispersion. The main features in the electronic structure of cluster are retained in the solid, and an energy gap up to about 1.5 eV is observed for Al12C and Al12Si solids.

  14. C/C-SiC Composites for Nozzle of Solid Propellant Ramjet

    Directory of Open Access Journals (Sweden)

    WANG Lingling

    2017-01-01

    Full Text Available Carbon fiber reinforced carbon and silicon carbide matrix composites for nozzle inner of solid propellant ramjet were prepared by using the hybrid process of "chemical vapor infiltration + precursor impregnation pyrolysis (CVI+PIP". The microstructure, flexural and anti-ablation properties of the C/C-SiC composites and hydraulic test and rocket motor hot firing test for nozzle inner of solid propellant ramjet were comprehensively investigated. The results show that when the flexural strength of the composite reachs 197 MPa, the fracture damage behavior of the composites presents typical toughness mode.Also the composites has excellent anti-ablative property, i.e., linear ablation rate is only 0.0063 mm·s-1 after 200 s ablation. The C/C-SiC component have excellent integral bearing performance with the hydraulic bursting pressure of 6.5 MPa, and the high temperature combination property of the C/C-SiC composite nozzle inner is verified through motor hot firing of solid propellant ramjet.

  15. Improved PEDOT:PSS/c-Si hybrid solar cell using inverted structure and effective passivation.

    Science.gov (United States)

    Zhang, Xisheng; Yang, Dong; Yang, Zhou; Guo, Xiaojia; Liu, Bin; Ren, Xiaodong; Liu, Shengzhong Frank

    2016-10-11

    The PEDOT:PSS is often used as the window layer in the normal structured PEDOT:PSS/c-Si hybrid solar cell (HSC), leading to significantly reduced response, especially in red and near-infrared region. By depositing the PEDOT:PSS on the rear side of the c-Si wafer, we developed an inverted structured HSC with much higher solar cell response in the red and near-infrared spectrum. Passivating the other side with hydrogenated amorphous silicon (a-Si:H) before electrode deposition, the minority carrier lifetime has been significantly increased and the power conversion efficiency (PCE) of the inverted HSC is improved to as high as 16.1% with an open-circuit voltage (Voc) of 634 mV, fill factor (FF) of 70.5%, and short-circuit current density (Jsc) of 36.2 mA cm(-2), an improvement of 33% over the control device. The improvements are ascribed to inverted configuration and a-Si:H passivation, which can increase photon carrier generation and reduce carrier recombination, respectively. Both of them will benefit the photovoltaic performance and should be considered as effective design strategies to improve the performance of organic/c-Si HSCs.

  16. Improved PEDOT:PSS/c-Si hybrid solar cell using inverted structure and effective passivation

    Science.gov (United States)

    Zhang, Xisheng; Yang, Dong; Yang, Zhou; Guo, Xiaojia; Liu, Bin; Ren, Xiaodong; Liu, Shengzhong (Frank)

    2016-10-01

    The PEDOT:PSS is often used as the window layer in the normal structured PEDOT:PSS/c-Si hybrid solar cell (HSC), leading to significantly reduced response, especially in red and near-infrared region. By depositing the PEDOT:PSS on the rear side of the c-Si wafer, we developed an inverted structured HSC with much higher solar cell response in the red and near-infrared spectrum. Passivating the other side with hydrogenated amorphous silicon (a-Si:H) before electrode deposition, the minority carrier lifetime has been significantly increased and the power conversion efficiency (PCE) of the inverted HSC is improved to as high as 16.1% with an open-circuit voltage (Voc) of 634 mV, fill factor (FF) of 70.5%, and short-circuit current density (Jsc) of 36.2 mA cm-2, an improvement of 33% over the control device. The improvements are ascribed to inverted configuration and a-Si:H passivation, which can increase photon carrier generation and reduce carrier recombination, respectively. Both of them will benefit the photovoltaic performance and should be considered as effective design strategies to improve the performance of organic/c-Si HSCs.

  17. Zero lattice mismatch and twin-free single crystalline ScN buffer layers for GaN growth on silicon

    Energy Technology Data Exchange (ETDEWEB)

    Lupina, L.; Zoellner, M. H.; Dietrich, B.; Capellini, G. [IHP, Im Technologiepark 25, 15236 Frankfurt, Oder (Germany); Niermann, T.; Lehmann, M. [Technische Universität Berlin, Institut für Optik und Atomare Physik, Straße des 17. Juni 135, 10623 Berlin (Germany); Thapa, S. B.; Haeberlen, M.; Storck, P. [SILTRONIC AG, Hanns-Seidel-Platz 4, 81737 München (Germany); Schroeder, T. [IHP, Im Technologiepark 25, 15236 Frankfurt, Oder (Germany); BTU Cottbus, Konrad-Zuse-Str. 1, 03046 Cottbus (Germany)

    2015-11-16

    We report the growth of thin ScN layers deposited by plasma-assisted molecular beam epitaxy on Sc{sub 2}O{sub 3}/Y{sub 2}O{sub 3}/Si(111) substrates. Using x-ray diffraction, Raman spectroscopy, and transmission electron microscopy, we find that ScN films grown at 600 °C are single crystalline, twin-free with rock-salt crystal structure, and exhibit a direct optical band gap of 2.2 eV. A high degree of crystalline perfection and a very good lattice matching between ScN and GaN (misfit < 0.1%) makes the ScN/Sc{sub 2}O{sub 3}/Y{sub 2}O{sub 3} buffer system a very promising template for the growth of high quality GaN layers on silicon.

  18. Silicon on glass grown from indium and tin solutions

    Science.gov (United States)

    Bansen, Roman; Ehlers, Christian; Teubner, Thomas; Böttcher, Klaus; Gambaryan, Karen; Schmidtbauer, Jan; Boeck, Torsten

    2016-04-01

    A two-step process is used to grow crystalline silicon (c-Si) on glass at low temperatures. In the first step, nanocrystalline seed layers are formed at temperatures in the range of 230 to 400°C by either metal-induced crystallization or by direct deposition on heated substrates. In the second step, c-Si is grown on the seed layer by steady-state liquid phase epitaxy at a temperature range of 580 to 710°C. Microcrystalline Si layers with grain sizes of up to several tens of micrometers are grown from In and Sn solutions. Three-dimensional simulations of heat and convective flow in the crucible have been conducted and give valuable insights into the growth process. The experimental results are promising with regard to the designated use of the material in photovoltaics.

  19. Modelling on c-Si/a-Si:H wire solar cells: some key parameters to optimize the photovoltaic performance

    Directory of Open Access Journals (Sweden)

    Alvarez J.

    2012-07-01

    Full Text Available Solar cells based on silicon nano- or micro-wires have attracted much attention as a promising path for low cost photovoltaic technology. The key point of this structure is the decoupling of the light absorption from the carriers collection. In order to predict and optimize the performance potential of p- (or n- doped c-Si/ n-(or p- doped a-Si:H nanowire-based solar cells, we have used the Silvaco-Atlas software to model a single-wire device. In particular, we have noticed a drastic decrease of the open-circuit voltage (Voc when increasing the doping density of the silicon core beyond an optimum value. We present here a detailed study of the parameters that can alter the Voc of c-Si(p/a-Si:H (n wires according to the doping density in c-Si. A comparison with simulation results obtained on planar c-Si/a-Si:H heterojunctions shows that the drop in Voc, linked to an increase of the dark current in both structures, is more pronounced for radial junctions due to geometric criteria. These numerical modelling results have lead to a better understanding of transport phenomena within the wire.

  20. Research and development of photovoltaic power system. Characterization and control of surface/interface recombination velocity of crystalline silicon thin films; Taiyoko hatsuden system no kenkyu kaihatsu. Silicon kessho usumaku ni okeru hyomen kaimen saiketsugo sokudo no hyoka to seigyo

    Energy Technology Data Exchange (ETDEWEB)

    Hasegawa, H. [Hokkaido University, Sapporo (Japan). Faculty of Engineering

    1994-12-01

    This paper reports the result obtained during fiscal 1994 on characterization and control of surface/interface recombination velocity of crystalline silicon thin films. To optimize design and manufacture of solar cells, it is necessary to identify correctly resistance factor (or doping) of bulk of materials, bulk minority carrier life, and recombination velocity on surface, passivation interface and electrode interface. A group in the Hokkaido University has been working since a few years ago on development of non-contact and non-destructive photo-luminescence surface level spectroscopy (PLS{sup 3}). A new non-contact C-V method was also introduced. Using these methods, basic discussions were given on possibility of separate measurements on surface/interface and bulk characteristics of solar cell materials. The PLS{sup 3} method and the non-contact C-V method were used for experimental discussions on evaluation of silicon mono-crystalline and poly-crystalline materials. Discussions were given on separate evaluations by using the DLTS method. 10 figs., 2 tabs.

  1. The effect of heating power on impurity formation and transport during the holding phase in a Bridgman furnace for directional solidification of multi-crystalline silicon

    Science.gov (United States)

    Ellingsen, Kjerstin; Lindholm, Dag; M`Hamdi, Mohammed

    2016-06-01

    Oxygen and carbon are the most common impurities in multi-crystalline silicon. The general mechanism for formation and transport of O and C in the solidification furnace is as follows: oxygen from the silica crucible comes into the melt and combines with a silicon atom and evaporates at the gas/melt interface in the form of silicon oxide (SiO). Argon inert gas, injected into the furnace chamber, carries the SiO to the hot graphite fixtures, where it reacts with carbon to form carbon monoxide (CO) and silicon carbide (SiC). CO is carried by the gas to the melt free surface, where it dissociates into carbon and oxygen. Finally, during solidification oxygen and carbon are incorporated into the crystal. A global furnace model accounting for heat transfer, melt flow, gas flow and impurity transport has been applied to investigate the oxygen and carbon formation and transport in a vertical Bridgman furnace during the holding phase when the furnace is at its hottest. A case study is performed to investigate the effect of the applied heating power on the carbon and oxygen concentrations in the melt prior to solidification.

  2. Optical Properties of Black Silicon: An Analysis

    Science.gov (United States)

    Marthi, Sita Rajyalaxmi; Sekhri, Suramya; Ravindra, N. M.

    2015-09-01

    Silicon (Si) continues to be the dominant semiconducting material used in photovoltaic technology for the manufacture of solar cells. Si, an indirect band gap semiconducting material, has a reflectance of about 30% in the visible range of wavelengths. Standard Si solar cells are not entirely useful in the infrared spectrum region. In order to enhance the performance of silicon solar cells, reflectance losses must be minimized and absorption must be maximized. In the solar cell industry, anti-reflection (AR) coating is used to suppress reflection losses. AR coatings are limited in use because they only reduce the reflectance for a narrow range of wavelengths and incident angle since their functionality is based on a quarter-wavelength coating. Surface texturing is a technique, by which the reflectivity is reduced in a wide range of wavelengths. Black silicon (B-Si) is a material with surface roughness in the micron scale. B-Si, when used instead of crystalline Si (c-Si), offers the possibility to increase the absorption of light in the visible and infrared range of wavelengths. B-Si has a very low reflectivity in the visible range of wavelengths. It exhibits high absorptance in the visible and infrared region. The main objective of this paper is to study the optical properties of B-Si by simulation and compare them with the simulated and experimental optical properties of B-Si and c-Si.

  3. Phase Stability and Thermal Conductivity of Composite Environmental Barrier Coatings on SiC/SiC Ceramic Matrix Composites

    Science.gov (United States)

    Benkel, Samantha; Zhu, Dongming

    2011-01-01

    Advanced environmental barrier coatings are being developed to protect SiC/SiC ceramic matrix composites in harsh combustion environments. The current coating development emphasis has been placed on the significantly improved cyclic durability and combustion environment stability in high-heat-flux and high velocity gas turbine engine environments. Environmental barrier coating systems based on hafnia (HfO2) and ytterbium silicate, HfO2-Si nano-composite bond coat systems have been processed and their stability and thermal conductivity behavior have been evaluated in simulated turbine environments. The incorporation of Silicon Carbide Nanotubes (SiCNT) into high stability (HfO2) and/or HfO2-silicon composite bond coats, along with ZrO2, HfO2 and rare earth silicate composite top coat systems, showed promise as excellent environmental barriers to protect the SiC/SiC ceramic matrix composites.

  4. Silicon heterojunction solar cell and crystallization of amorphous silicon

    Science.gov (United States)

    Lu, Meijun

    The rapid growth of photovoltaics in the past decade brings on the soaring price and demand for crystalline silicon. Hence it becomes necessary and also profitable to develop solar cells with over 20% efficiency, using thin (˜100mum) silicon wafers. In this respect, diffused junction cells are not the best choice, since the inescapable heating in the diffusion process not only makes it hard to handle thin wafers, but also reduces carriers' bulk lifetime and impairs the crystal quality of the substrate, which could lower cell efficiency. An alternative is the heterojunction cells, such as amorphous silicon/crystalline silicon heterojunction (SHJ) solar cell, where the emitter layer can be grown at low temperature (solar cell, including the importance of intrinsic buffer layer; the discussion on the often observed anomalous "S"-shaped J-V curve (low fill factor) by using band diagram analysis; the surface passivation quality of intrinsic buffer and its relationship to the performance of front-junction SHJ cells. Although the a-Si:H is found to help to achieve high efficiency in c-Si heterojuntion solar cells, it also absorbs short wavelength (cells. Considering this, heterojunction with both a-Si:H emitter and base contact on the back side in an interdigitated pattern, i.e. interdigitated back contact silicon heterojunction (IBC-SHJ) solar cell, is developed. This dissertation will show our progress in developing IBC-SHJ solar cells, including the structure design; device fabrication and characterization; two dimensional simulation by using simulator Sentaurus Device; some special features of IBC-SHJ solar cells; and performance of IBC-SHJ cells without and with back surface buffer layers. Another trend for solar cell industry is thin film solar cells, since they use less materials resulting in lower cost. Polycrystalline silicon (poly-Si) is one promising thin-film material. It has the potential advantages to not only retain the performance and stability of c-Si

  5. Efficient silicon heterojunction solar cells based on p- and n-type substrates processed at temperatures < 220 deg C

    Energy Technology Data Exchange (ETDEWEB)

    Maydell, K.v.; Conrad, E.; Schmidt, M. [Hahn-Meitner-Institut, Berlin (Germany)

    2006-07-01

    We present the optimization and characterization of heterojunction solar cells consisting of an amorphous silicon emitter, a single crystalline absorber and an amorphous silicon rear side which causes the formation of a back surface field (a-Si:H/c-Si/a-Si:H). The solar cells were processed at temperatures <220 deg C. An optimum of the gas phase doping concentration of the a-Si:H layers was found. For high gas phase doping concentrations, recombination via defects located at or nearby the interface leads to a decrease in solar cell efficiency. We achieved efficiencies >17% on p-type c-Si absorbers and >17.5% on n-type absorbers. In contrast to the approach of Sanyo, no additional intrinsic a-Si:H layers between the substrate and the doped a-Si:H layers were inserted. (Author)

  6. Low temperature characteristic of ITO/SiO x /c-Si heterojunction solar cell

    Science.gov (United States)

    Du, H. W.; Yang, J.; Li, Y.; Gao, M.; Chen, S. M.; Yu, Z. S.; Xu, F.; Ma, Z. Q.

    2015-09-01

    Based on the temperature-dependent measurements and the numerical calculation, the temperature response of the photovoltaic parameters for a ITO/SiO x /c-Si heterojunction solar cell have been investigated in the ascending sorting of 10-300 K. Under unique energy concentrated photon irradiation with the wavelength of 405 nm and power density of 667 mW cm-2, it was found that the short-circuit current (I SC) was nonlinearly increased and the open-circuit voltage (V OC) decreased with temperature. The good passivation of the ITO/c-Si interface by a concomitant SiO x buffer layer leads to the rare recombination of carriers in the intermediate region. The inversion layer model indicated that the band gap of c-silicon was narrowed and the Fermi level of n-type silicon (E\\text{F}n ) tended to that of the intrinsic Fermi level (E\\text{F}i ) (in the middle of band gap) with the increase of the temperature, which lessened the built-in voltage (V D) and thus the V OC. However, the reduction by 90% of V OC is attributed to the shift of E\\text{F}n in c-silicon rather than the energy band narrowing. Through the analysis of the current-voltage relationship and the data fitting, we infer that the series resistance (R s) is not responsible for the increase of I SC, but the absorption coefficient and the depletion-width of c-silicon are the causes of the enhancing I SC. Mostly, the interaction of the photon-generated excess ‘cold hole’ and the acoustic phonon in n-Si would influence the variation of I ph or I SC with temperature.

  7. Role of the buffer layer in the active junction in amorphous-crystalline silicon heterojunction solar cells

    Science.gov (United States)

    Pallarès, J.; Schropp, R. E. I.

    2000-07-01

    We fabricated pn and pin a-SiC:H/c-Si heterojunction solar cells following two different processes. In the first approach, wafers were subjected to an extra atomic hydrogen (produced by hot wire chemical vapor deposition) prior to the deposition of the amorphous layer. A reduction in the open-circuit voltage was observed for the passivated cells due to their higher leakage current. In the second process, pin solar cells with two different quality intrinsic a-Si:H buffer layers were fabricated using plasma enhanced chemical vapor deposition. The cells with a device quality buffer layer (deposited at higher temperature) showed better performance than those with a buffer layer with high hydrogen content and higher defect density (deposited at lower temperatures).

  8. Influence of helium atoms on the shear behavior of the fiber/matrix interphase of SiC/SiC composite

    Science.gov (United States)

    Jin, Enze; Du, Shiyu; Li, Mian; Liu, Chen; He, Shihong; He, Jian; He, Heming

    2016-10-01

    Silicon carbide has many attractive properties and the SiC/SiC composite has been considered as a promising candidate for nuclear structural materials. Up to now, a computational investigation on the properties of SiC/SiC composite varying in the presence of nuclear fission products is still missing. In this work, the influence of He atoms on the shear behavior of the SiC/SiC interphase is investigated via Molecular Dynamics simulation following our recent paper. Calculations are carried out on three dimensional models of graphite-like PyC/SiC interphase and amorphous PyC/SiC interphase with He atoms in different regions (the SiC region, the interface region and the PyC region). In the graphite-like PyC/SiC interphase, He atoms in the SiC region have little influence on the shear strength of the material, while both the shear strength and friction strength may be enhanced when they are in the PyC region. Low concentration of He atoms in the interface region of the graphite-like PyC/SiC interphase increases the shear strength, while there is a reduction of shear strength when the He concentration is high due to the switch of sliding plane. In the amorphous PyC/SiC interphase, He atoms can cause the reduction of the shear strength regardless of the regions that He atoms are located. The presence of He atoms may significantly alter the structure of SiC/SiC in the interface region. The influence of He atoms in the interface region is the most significant, leading to evident shear strength reduction of the amorphous PyC/SiC interphase with increasing He concentration. The behaviors of the interphases at different temperatures are studied as well. The dependence of the shear strengths of the two types of interphases on temperatures is studied as well. For the graphite-like PyC/SiC interphase, it is found strongly related to the regions He atoms are located. Combining these results with our previous study on pure SiC/SiC system, we expect this work may provide new insight

  9. 双面单晶硅光伏电池技术及工艺探索%Exploration of Crystalline Silicon Bifacial Photovoltaic Cell Technology and Process

    Institute of Scientific and Technical Information of China (English)

    张中伟; 张小宾; 侯泽荣; 黄仑

    2014-01-01

    对双面晶体硅电池技术和工艺做了初步的阐述,并以双面P型单晶硅电池为研究对象,对双面电池制程中的硼扩散、边缘刻蚀、硼扩散面钝化几个关键技术和工艺展开研究和探索,得出其中工艺参数与电池性能之间的相互联系,实验制作得到的P型双面电池片最高综合效率达20.04%。这些技术和制备工艺流程对于未来高效晶硅电池的研发和生产具有重要的参考价值。%This paper introduces the bifacial crystalline silicon photovoltaic cell technology and production process, using P type monocrystalline silicon bifacial solar cell as research object, the introduction is follwed by investigations on such key technical aspects and processes such as boron diffusion, edge isolation etching and boron diffused surface passivation as well as study on the relationship between process parameters and cell performance. The results reveal that the best bifacial cell fabricated in experiments had a combined efficiency of 20. 04%, Which are valuable for further high efficient crystalline silicon solar cell research and production.

  10. Eutectic and solid-state wafer bonding of silicon with gold

    Energy Technology Data Exchange (ETDEWEB)

    Abouie, Maryam; Liu, Qi [Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB, Canada T6G 2V4 (Canada); Ivey, Douglas G., E-mail: doug.ivey@ualberta.ca [Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB, Canada T6G 2V4 (Canada)

    2012-12-01

    Highlights: Black-Right-Pointing-Pointer Eutectic and solid-state Au-Si bonding are compared for both a-Si and c-Si samples. Black-Right-Pointing-Pointer Exchange of a-Si and Au layer was observed in both types of bonded samples. Black-Right-Pointing-Pointer Use of c-Si for bonding resulted in formation of craters at the Au/c-Si interface. Black-Right-Pointing-Pointer Solid-state Au-Si bonding produces better bonds in terms of microstructure. - Abstract: The simple Au-Si eutectic, which melts at 363 Degree-Sign C, can be used to bond Si wafers. However, faceted craters can form at the Au/Si interface as a result of anisotropic and non-uniform reaction between Au and crystalline silicon (c-Si). These craters may adversely affect active devices on the wafers. Two possible solutions to this problem were investigated in this study. One solution was to use an amorphous silicon layer (a-Si) that was deposited on the c-Si substrate to bond with the Au. The other solution was to use solid-state bonding instead of eutectic bonding, and the wafers were bonded at a temperature (350 Degree-Sign C) below the Au-Si eutectic temperature. The results showed that the a-Si layer prevented the formation of craters and solid-state bonding not only required a lower bonding temperature than eutectic bonding, but also prevented spill out of the solder resulting in strong bonds with high shear strength in comparison with eutectic bonding. Using amorphous silicon, the maximum shear strength for the solid-state Au-Si bond reached 15.2 MPa, whereas for the eutectic Au-Si bond it was 13.2 MPa.

  11. PIE of nuclear grade SiC/SiC flexural coupons irradiated to 10 dpa at LWR temperature

    Energy Technology Data Exchange (ETDEWEB)

    Koyanagi, Takaaki [Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Katoh, Yutai [Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

    2017-03-01

    Silicon carbide fiber-reinforced SiC matrix (SiC/SiC) composites are being actively investigated for accident-tolerant core structures of light water reactors (LWRs). Owing to the limited number of irradiation studies previously conducted at LWR-coolant temperature, this study examined SiC/SiC composites following neutron irradiation at 230–340°C to 2.0 and 11.8 dpa in the High Flux Isotope Reactor. The investigated materials are chemical vapor infiltrated (CVI) SiC/SiC composites with three different reinforcement fibers. The fiber materials were monolayer pyrolytic carbon (PyC)-coated Hi-NicalonTM Type-S (HNS), TyrannoTM SA3 (SA3), and SCS-UltraTM (SCS) SiC fibers. The irradiation resistance of these composites was investigated based on flexural behavior, dynamic Young’s modulus, swelling, and microstructures. There was no notable mechanical properties degradation of the irradiated HNS and SA3 SiC/SiC composites except for reduction of the Young’s moduli by up to 18%. The microstructural stability of these composites supported the absence of degradation. In addition, no progressive swelling from 2.0 to 11.8 dpa was confirmed for these composites. On the other hand, the SCS composite showed significant mechanical degradation associated with cracking within the fiber. This study determined that SiC/SiC composites with HNS or SA3 SiC/SiC fibers, a PyC interphase, and a CVI SiC matrix retain their properties beyond the lifetime dose for LWR fuel cladding at the relevant temperature.

  12. Microcrystalline silicon films and solar cells investigatet by photoluminescence spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Merdzhanova, T.

    2005-07-01

    A systematic investigation on photoluminescence (PL) properties of microcrystalline silicon ({mu}c-Si:H) films with structural composition changing from highly crystalline to predominantly amorphous is presented. The samples were prepared by PECVD and HWCVD with different silane concentration in hydrogen (SC). By using photoluminescence in combination with Raman spectroscopy the relationship between electronic properties and the microstructure of the material is studied. The PL spectra of {mu}c-Si:H reveal a rather broad ({proportional_to}0.13 eV) featureless band at about 1 eV ('{mu}c'-Si-band). In mixed phase material of crystalline and amorphous regions, a band at about 1.3 eV with halfwidth of about 0.3 eV is found in addition to '{mu}c'-Si-band, which is attributed to the amorphous phase ('a'-Si-band). Similarly to amorphous silicon, the '{mu}c'-Si-band is assigned to recombination between electrons and holes in band tail states. An additional PL band centred at about 0.7 eV with halfwidth slightly broader than the '{mu}c'-Si-band is observed only for films prepared at high substrate temperature and it is preliminarily assigned to defect-related transitions as in polycrystalline silicon. With decreasing crystalline volume fraction, the '{mu}c'-Si-band shifts continuously to higher energies for all {mu}c-Si:H films but the linewidth of the PL spectra is almost unaffected. This is valid for all deposition conditions investigated. The results are interpreted, assuming decrease of the density of band tail states with decreasing crystalline volume fraction. A simple model is proposed to simulate PL spectra and V{sub oc} in {mu}c-Si:H solar cells as a function of temperature, based on carrier distributions in quasi-equilibrium conditions. In the model is assumed symmetric density of states distributions for electrons and holes in the conduction and the valence band tail states. The best agreement between

  13. 以技术创新推动晶体硅太阳能电池智慧生产线建设%Intelligent Production Line Construction of Crystalline Silicon Solar Cell through Technological innovation

    Institute of Scientific and Technical Information of China (English)

    谢建国; 赵加宝

    2014-01-01

    In this paper, the status of the technology of crystalline silicon solar cell production line was reviewed, the future trends of crystal silicon solar cell technology is analyzed, and the technical characteristic of modern crystalline silicon cell production line was summarized, proposing that the combination of innovative technology and equipment, efficient process automation, intelligent monitoring and decision-making are the three main features of modern intelligent crystalline silicon cell production line. On this basis, an intelligent crystalline silicon cell manufacturing system frame with modern technical features was proposed, and its structure, design and implementation were briefly introduced.%综述了晶体硅太阳能电池生产线的技术现状,并结合晶体硅电池技术的未来发展方向,分析了晶体硅太阳能电池生产线技术的发展趋势,认为创新工艺及设备、高产能及高效自动化、监控与决策智能化是未来晶体硅太阳能电池生产线的三大主要特征,在此基础上,提出了一种晶体硅太阳能电池智慧生产线,简要介绍了其结构组成,特点及实现。1

  14. Metal organic vapor phase epitaxy growth of (Al)GaN heterostructures on SiC/Si(111) templates synthesized by topochemical method of atoms substitution

    DEFF Research Database (Denmark)

    Rozhavskaia, Mariia M.; Kukushkin, Sergey A.; Osipov, Andrey

    2017-01-01

    crystalline interfaces with epitaxial relationship between SiC/Si and AlN/SiC layers. Optimization of SiC morphology and AlN seed layer thickness facilitates the growth of GaN layers free of pits (v-defects). It is also found that Si doping eliminates these defects in the case of growth on SiC templates...

  15. The Light-Induced Field-Effect Solar Cell Concept - Perovskite Nanoparticle Coating Introduces Polarization Enhancing Silicon Cell Efficiency.

    Science.gov (United States)

    Wang, Yusheng; Xia, Zhouhui; Liu, Lijia; Xu, Weidong; Yuan, Zhongcheng; Zhang, Yupeng; Sirringhaus, Henning; Lifshitz, Yeshayahu; Lee, Shui-Tong; Bao, Qiaoliang; Sun, Baoquan

    2017-03-03

    Solar cell generates electrical energy from light one via pulling excited carrier away under built-in asymmetry. Doped semiconductor with antireflection layer is general strategy to achieve this including crystalline silicon (c-Si) solar cell. However, loss of extra energy beyond band gap and light reflection in particular wavelength range is known to hinder the efficiency of c-Si cell. Here, it is found that part of short wavelength sunlight can be converted into polarization electrical field, which strengthens asymmetry in organic-c-Si heterojunction solar cell through molecule alignment process. The light harvested by organometal trihalide perovskite nanoparticles (NPs) induces molecular alignment on a conducting polymer, which generates positive electrical surface field. Furthermore, a "field-effect solar cell" is successfully developed and implemented by combining perovskite NPs with organic/c-Si heterojunction associating with light-induced molecule alignment, which achieves an efficiency of 14.3%. In comparison, the device with the analogous structure without perovskite NPs only exhibits an efficiency of 12.7%. This finding provides a novel concept to design solar cell by sacrificing part of sunlight to provide "extra" asymmetrical field continuously as to drive photogenerated carrier toward respective contacts under direct sunlight. Moreover, it also points out a method to combine promising perovskite material with c-Si solar cell.

  16. Comparative study. Thin-film technology (si-a) compared to crystalline silicon in real operating conditions; Estudio comparativo. Tecnologia de capa fina (Si-a) frente a silicio cristalino en condiciones reales de funcionamiento

    Energy Technology Data Exchange (ETDEWEB)

    Izard Gomez-Rodulfo, J.; Avellaner, J.; Sanchez, E.; Torreblanca, J.

    2010-07-01

    We present a comparative study of thin film solar modules (amorphous silicon) compared to crystalline silicon modules. This study was conducted in real operating conditions using a test bench able to obtain the characteristic curve of several modules in sequence. defined the parameter efficiency index to characterize the extent to which actual performance is close to ideal. Finally we have calculated the energy that would produce each module in the day and efficiency in relation to the energy which ideally should produce. (Author)

  17. Tuning the optical properties of RF-PECVD grown μc-Si:H thin films using different hydrogen flow rate

    Science.gov (United States)

    Dushaq, Ghada; Nayfeh, Ammar; Rasras, Mahmoud

    2017-07-01

    In this paper we study the effect of H2/SiH4 dilution ratio (R) on the structural and optical properties of hydrogenated microcrystalline silicon embedded in amorphous matrix thin films. The thin films are prepared using standard RF-PECVD process at substrate temperature of 200 °C. The effect of hydrogen dilution ratio on the optical index of refraction and the absorption coefficient were investigated. It was observed that by incorporating higher hydrogen flow rate in the films with low SiH4 concentration, the optical index of refraction can be tuned over a broad range of wavelengths due to the variation of crystalline properties of the produced films. By varying the hydrogen flow of μc-Si:H samples, ∼8% and 12% reduction in the index of refraction at 400 nm and at 1500 nm can be achieved, respectively. In addition a 78% reduction in surface roughness is obtained when 60sccm of H2 is used in the deposition compared to the sample without any H2 incorporation.

  18. On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

    Science.gov (United States)

    Hoex, B.; Gielis, J. J. H.; van de Sanden, M. C. M.; Kessels, W. M. M.

    2008-12-01

    Al2O3 is a versatile high-κ dielectric that has excellent surface passivation properties on crystalline Si (c-Si), which are of vital importance for devices such as light emitting diodes and high-efficiency solar cells. We demonstrate both experimentally and by simulations that the surface passivation can be related to a satisfactory low interface defect density in combination with a strong field-effect passivation induced by a negative fixed charge density Qf of up to 1013 cm-2 present in the Al2O3 film at the interface with the underlying Si substrate. The negative polarity of Qf in Al2O3 is especially beneficial for the passivation of p-type c-Si as the bulk minority carriers are shielded from the c-Si surface. As the level of field-effect passivation is shown to scale with Qf2, the high Qf in Al2O3 tolerates a higher interface defect density on c-Si compared to alternative surface passivation schemes.

  19. SiC-Si interfacial thermal and mechanical properties of reaction bonded SiC/Si ceramic composites

    Science.gov (United States)

    Hsu, Chun-Yen; Deng, Fei; Karandikar, Prashant; Ni, Chaoying

    Reaction bonded SiC/Si (RBSC) ceramic composites are broadly utilized in military, semiconductor and aerospace industries. RBSC affords advanced specific stiffness, hardness and thermal. Interface is a key region that has to be considered when working with any composites. Both thermal and mechanical behaviors of the RBSC are highly dependent on the SiC-Si interface. The SiC-Si interface had been found to act as a thermal barrier in restricting heat transferring at room temperature and to govern the energy absorption ability of the RBSC. However, up to present, the role of the SiC-Si interface to transport heat at higher temperatures and the interfacial properties in the nanoscale have not been established. This study focuses on these critically important subjects to explore scientific phenomena and underlying mechanisms. The RBSC thermal conductivity with volume percentages of SiC at 80 and 90 vol% was measured up to 1,200 °C, and was found to decrease for both samples with increasing environmental temperature. The RBSC with 90 vol% SiC has a higher thermal conductivity than that of the 80 vol%; however, is still significantly lower than that of the SiC. The interfacial thermal barrier effect was found to decrease at higher temperatures close 1200 °C. A custom-made in-situ tensile testing device which can be accommodated inside a ZEISS Auriga 60 FIB/SEM has been setup successfully. The SiC-Si interfacial bonding strength was measured at 98 MPa. The observation and analysis of crack propagation along the SiC-Si interface was achieved with in-situ TEM.

  20. Grazing incidence X-ray fluorescence analysis of buried interfaces in periodically structured crystalline silicon thin-film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Eisenhauer, David; Preidel, Veit; Becker, Christiane [Young Investigator Group Nanostructured Silicon for Photovoltaic and Photonic Implementations (Nano-SIPPE), Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Berlin (Germany); Pollakowski, Beatrix; Beckhoff, Burkhard [Physikalisch-Technische Bundesanstalt, Berlin (Germany); Baumann, Jonas; Kanngiesser, Birgit [Institut fuer Optik und Atomare Physik, Technische Universitaet Berlin (Germany); Amkreutz, Daniel; Rech, Bernd [Institut Silizium Photovoltaik, Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Berlin (Germany); Back, Franziska; Rudigier-Voigt, Eveline [SCHOTT AG, Mainz (Germany)

    2015-03-01

    We present grazing incidence X-ray fluorescence (GIXRF) experiments on 3D periodically textured interfaces of liquid phase crystallized silicon thin-film solar cells on glass. The influence of functional layers (SiO{sub x} or SiO{sub x}/SiC{sub x}) - placed between glass substrate and silicon during crystallization - on the final carbon and oxygen contaminations inside the silicon was analyzed. Baring of the buried structured silicon surface prior to GIXRF measurement was achieved by removal of the original nano-imprinted glass substrate by wet-chemical etching. A broad angle of incidence distribution was determined for the X-ray radiation impinging on this textured surface. Optical simulations were performed in order to estimate the incident radiation intensity on the structured surface profile considering total reflection and attenuation effects. The results indicate a much lower contamination level for SiO{sub x} compared to the SiO{sub x}/SiC{sub x} interlayers, and about 25% increased contamination when comparing structured with planar silicon layers, both correlating with the corresponding solar cell performances. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  1. Structural and photovoltaic properties of a-Si (SNc)/c-Si heterojunction fabricated by EBPVD technique

    Energy Technology Data Exchange (ETDEWEB)

    Demiroğlu, D.; Kazmanli, K.; Urgen, M. [Department of Metallurgical and Materials Engineering, Istanbul Technical University, Ayazağa 34469, Istanbul (Turkey); Tatar, B. [Faculty of Arts and Sciences, Department of Physics, Namık Kemal University, Değirmenaltı, Tekirdağ (Turkey)

    2013-12-16

    In last two decades sculptured thin films are very attractive for researches. Some properties of these thin films, like high porosity correspondingly high large surface area, controlled morphology; bring into prominence on them. Sculptured thin films have wide application areas as electronics, optics, mechanics, magnetic and chemistry. Slanted nano-columnar (SnC) thin films are a type of sculptured thin films. In this investigation SnC thin films were growth on n-type crystalline Si(100) and p-type crystalline Si(111) via ultra-high vacuum electron beam evaporation technique. The structural and morphological properties of the amorphous silicon thin films were investigated by XRD, Raman and FE-SEM analysis. According to the XRD and Raman analysis the structure of thin film was amorphous and FE-SEM analysis indicated slanted nano-columns were formed smoothly. Slanted nano-columns a-Si/c-Si heterojunction were prepared as using a photovoltaic device. In this regard we were researched photovoltaic properties of these heterojunction with current-voltage characterization under dark and illumination conditions. Electrical parameters were determined from the current-voltage characteristic in the dark conditions zero-bias barrier height Φ{sub B0} = 0.83−1.00eV; diode ideality factor η = 11.71−10.73; series resistance R{sub s} = 260−31.1 kΩ and shunt resistance R{sub sh} = 25.71−63.5 MΩ SnC a-Si/n-Si and SnC a-Si/p-Si heterojunctions shows a pretty good photovoltaic behavior about 10{sup 3}- 10{sup 4} times. The obtained photovoltaic parameters are such as short circuit current density J{sub sc} 83-40 mA/m{sup 2}, open circuit voltage V{sub oc} 900-831 mV.

  2. 太阳能级多晶硅片表面制绒的研究%Research of Texturization on Multi-crystalline Silicon Surface for Solar Cell

    Institute of Scientific and Technical Information of China (English)

    管世兵; 殷伟琦; 严俊; 顾顺超

    2013-01-01

    主要研究多晶硅太阳能电池片工业制绒的酸腐蚀过程,腐蚀液是由HNO3、HF和H2 SiF6组成的混合液,未添加其他试剂作为反应缓释剂;采用SEM和紫外分光光度计对多晶硅片表面制绒形貌进行观察和检测分析.实验过程中,按照工业生产的实际模型,首先研究确定了最佳腐蚀时间为2 min,之后主要研究了酸腐蚀过程中的H2SiF6浓度对多晶硅表面制绒效果的影响,优化得到H2SiF6的最低含量为2%,并确定最佳腐蚀工艺条件,为进一步回收利用腐蚀废液提供依据.%The acid etching process for industrial texturing of multi-crystalline silicon solar cells was studied. In this process, multi-crystalline silicon wafers were textured in acid solution, which was constituted with HNO3, HF and H2SiF6, without any other reagents as release agent. By using the SEM and UV spectrophotometer, detailed study of the surface morphology and optical properties of the different etched surfaces were carried out. During the experiment, the study was focused on the etching time at first, and obtained a best etching time of 2 min. Then the influence of H2SiF6 concentration in the acid solution on multi-crystalline silicon surface texturing effect was studied, with the actual model of industrial productioa From the analytical results, H2SiF6 content and etching conditions were optimized, which would be the basis for further recycling of waste solution.

  3. Synthesis, characterization, and wear and friction properties of variably structured SiC/Si elements made from wood by molten Si impregnation

    DEFF Research Database (Denmark)

    Dhiman, Rajnish; Rana, Kuldeep; Bengu, Erman

    2012-01-01

    We have synthesized pre-shaped SiC/Si ceramic material elements from charcoal (obtained from wood) by impregnation with molten silicon, which takes place in a two-stage process. In the first process, a porous structure of connected micro-crystals of β-SiC is formed, while, in the second process, ...

  4. Temperature-dependency analysis and correction methods of in-situ power-loss estimation for crystalline silicon modules undergoing potential-induced degradation stress testing

    DEFF Research Database (Denmark)

    Spataru, Sergiu; Hacke, Peter; Sera, Dezso

    2015-01-01

    We propose a method of in-situ characterization of the photovoltaic module power at standard test conditions using superposition of the dark current-voltage (I-V) curve measured at elevated stress temperature during potential-induced degradation (PID) testing. PID chamber studies were performed...... duration and cost, avoids stress transients while ramping to and from the stress temperature, eliminates flash testing except at the initial and final data points, and enables significantly faster and more detailed acquisition of statistical data for future application of various statistical reliability...... on several crystalline silicon module designs to determine the extent to which the temperature dependency of maximum power is affected by the degradation of the modules. The results using the superposition principle show a mismatch between the power degradation measured at stress temperature and the power...

  5. Physical Properties of C-Si Alloys in C2/m Structure

    Science.gov (United States)

    Wang, Qian-Kun; Chai, Chang-Chun; Fan, Qing-Yang; Yang, Yin-Tang

    2017-08-01

    Using the first principles calculations based on density functional theory, the crystal structure, elastic anisotropy, and electronic properties of carbon, silicon and their alloys (C 12 Si 4, C 8 Si 8, and C 4 Si 12 ) in a monoclinic structure (C2/m) are investigated. The calculated results such as lattice parameters, elastic constants, bulk modulus, and shear modulus of C 16 and Si 16 in C2/m structure are in good accord with previous work. The elastic constants show that C 16, Si 16, and their alloys in C2/m structure are mechanically stable. The calculated results of universal anisotropy index, compression and shear anisotropy percent factors indicate that C-Si alloys present elastic anisotropy, and C 8 Si 8 shows a greater anisotropy. The Poisson’s ratio and the B/G value show that C 8 Si 8 is ductile material and other four C-Si alloys are brittle materials. In addition, Debye temperature and average sound velocity are predicted utilizing elastic modulus and density of C-Si alloys. The band structure and the partial density of states imply that C 16 and Si 16 are indirect band gap semiconductors, while C 12 Si 4, C 8 Si 8, and C 4 Si 12 are semi-metallic alloys. Supported by the Natural Science Foundation of China under Grant No. 61474089, Open Fund of Key Laboratory of Complex Electromagnetic Environment Science and Technology, China Academy of Engineering Physics under Grant No. 2015-0214. YY.K

  6. Fabrication Technology and Characteristics of a Magnetic Sensitive Transistor with nc-Si:H/c-Si Heterojunction.

    Science.gov (United States)

    Zhao, Xiaofeng; Li, Baozeng; Wen, Dianzhong

    2017-01-22

    This paper presents a magnetically sensitive transistor using a nc-Si:H/c-Si heterojunction as an emitter junction. By adopting micro electro-mechanical systems (MEMS) technology and chemical vapor deposition (CVD) method, the nc-Si:H/c-Si heterojunction silicon magnetically sensitive transistor (HSMST) chips were designed and fabricated on a p-type orientation double-side polished silicon wafer with high resistivity. In addition, a collector load resistor ( R L ) was integrated on the chip, and the resistor converted the collector current ( I C ) to a collector output voltage ( V out ). When I B = 8.0 mA, V DD = 10.0 V, and R L = 4.1 kΩ, the magnetic sensitivity ( S V ) at room temperature and temperature coefficient ( α C ) of the collector current for HSMST were 181 mV/T and -0.11%/°C, respectively. The experimental results show that the magnetic sensitivity and temperature characteristics of the proposed transistor can be obviously improved by the use of a nc-Si:H/c-Si heterojunction as an emitter junction.

  7. Improvement of epitaxy and crystallinity in YBa2Cu3Oy thin films grown on silicon with double buffer of ECO/YSZ

    Institute of Scientific and Technical Information of China (English)

    GAO Ju; YANG Jian

    2006-01-01

    A novel double buffer of Eu2CuO4 (ECO)/YSZ (yttrium-stabilized zirconia) was developed for growing YBa2Cu3Oy (YBCO) thin films on Si substrates. In these films,the severe reaction between Si and YBCO is blocked by the first YSZ layer,whereas,the degradation of crystallinity and superconductivity in the grown YBCO is greatly improved by the second ECO layer. Such an ECO material possesses a very stable 214-T' structure and excellent compatibilities with YBCO and YSZ. The result shows that the epitaxy and crystallinity of YBCO deposited on Si could be considerably enhanced by using the ECO/YSZ double buffer. The grown films are characterized by high-resolution X-ray diffraction,grazing incidence X-ray reflection,and transmission electron microscopy (TEM),respectively. It is found that well defined interfaces are formed at YBCO/ECO/YSZ boundaries. No immediate layer could be seen. The defect density in all grown layers is kept at a lower level. The YBCO film surface turns out to be very smooth. These films have full superconducting transitions above 88 K and high current carrying capacity at 77 K. The successful growth of highly epitaxial YBCO thin films on silicon with ECO/YSZ buffer,demonstrate the advantages of such a double buffer structure.

  8. Silicon Diphosphide: A Si-Based Three-Dimensional Crystalline Framework as a High-Performance Li-Ion Battery Anode.

    Science.gov (United States)

    Kwon, Hyuk-Tae; Lee, Churl Kyoung; Jeon, Ki-Joon; Park, Cheol-Min

    2016-06-28

    The development of an electrode material for rechargeable Li-ion batteries (LIBs) and the understanding of its reaction mechanism play key roles in enhancing the electrochemical characteristics of LIBs for use in various portable electronics and electric vehicles. Here, we report a three-dimensional (3D) crystalline-framework-structured silicon diphosphide (SiP2) and its interesting electrochemical behaviors for superior LIBs. During Li insertion in the SiP2, a three-step electrochemical reaction mechanism, sequentially comprised of a topotactic transition (0.55-2 V), an amorphization (0.25-2 V), and a conversion (0-2 V), was thoroughly analyzed. On the basis of the three-step electrochemical reaction mechanism, excellent electrochemical properties, such as high initial capacities, high initial Coulombic efficiencies, stable cycle behaviors, and fast-rate capabilities, were attained from the preparation of a nanostructured SiP2/C composite. This 3D crystalline-framework-structured SiP2 compound will be a promising alternative anode material in the realization and mass production of excellent, rechargeable LIBs.

  9. Thickness effect on the formation of SiC nanoparticles in sandwiched Si/C/Si and C/Si multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Chung, C.K., E-mail: ckchung@mail.ncku.edu.t [Department of Mechanical Engineering, Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, 701, Taiwan (China); Wu, B.H.; Chen, T.S.; Peng, C.C.; Lai, C.W. [Department of Mechanical Engineering, Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, 701, Taiwan (China)

    2009-08-31

    The effect of carbon (C) and amorphous silicon (a-Si) thicknesses on the formation of SiC nanoparticles (np-SiC) in sandwiched Si/C/Si and C/Si multilayers on Si(100) substrates were investigated using ultra-high-vacuum ion beam sputtering system and vacuum thermal annealing at 500, 700, 900 {sup o}C for 1.0 h. Three-layer a-Si/C/a-Si structures with thicknesses of 50/200/50 nm and 75/150/75 nm and a two-layer C/a-Si structure of 200/50 nm were examined in this study. The size and density of np-SiC were strongly influenced by the annealing temperature, a-Si thickness and layer number. Many np-SiC appeared at 900 {sup o}C at a density order about 10{sup 8} cm{sup -2} in both three-layer structures while no particles formed in the two-layer structure. The thick a-Si structure (75/150/75 nm) produces a particle density approximately 1.8 times higher than thin structure (50/200/50 nm). This implies that thick a-Si structure had a lower activation energy of SiC formation compared to the thin a-Si structure. Few particles were found at 700 {sup o}C and no particles at 500 {sup o}C in both three-layer structures. The np-SiC formation is a thermally activated reaction. The higher temperature leads to higher particle density. A mechanism of np-SiC formation in thermodynamic and kinetic viewpoints is proposed.

  10. Low cost sol–gel derived SiC–SiO{sub 2} nanocomposite as anti reflection layer for enhanced performance of crystalline silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Jannat, Azmira [School of Semiconductor and Chemical Engineering, Solar Energy Research Center, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); Solar Energy Engineering, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); Lee, Woojin [School of Semiconductor and Chemical Engineering, Solar Energy Research Center, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); Akhtar, M. Shaheer, E-mail: shaheerakhtar@jbnu.ac.kr [School of Semiconductor and Chemical Engineering, Solar Energy Research Center, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); New & Renewable Energy Materials Development Center (NewREC), Chonbuk National University, Jeonbuk (Korea, Republic of); Li, Zhen Yu [School of Semiconductor and Chemical Engineering, Solar Energy Research Center, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); Yang, O.-Bong, E-mail: obyang@jbnu.ac.kr [School of Semiconductor and Chemical Engineering, Solar Energy Research Center, Chonbuk National University, Jeonju, Jeonbuk 54896 (Korea, Republic of); New & Renewable Energy Materials Development Center (NewREC), Chonbuk National University, Jeonbuk (Korea, Republic of)

    2016-04-30

    Graphical abstract: - Highlights: • Sol–gel derived SiC–SiO{sub 2} nanocomposite was prepared. • It effectively coated as AR layer on p-type Si-wafer. • SiC–SiO{sub 2} layer on Si solar cells exhibited relatively low reflectance of 7.08%. • Fabricated Si solar cell attained highly comparable performance of 16.99% to commercial device. - Abstract: This paper describes the preparation, characterizations and the antireflection (AR) coating application in crystalline silicon solar cells of sol–gel derived SiC–SiO{sub 2} nanocomposite. The prepared SiC–SiO{sub 2} nanocomposite was effectively applied as AR layer on p-type Si-wafer via two step processes, where the sol–gel of precursor solution was first coated on p-type Si-wafer using spin coating at 2000 rpm and then subjected to annealing at 450 °C for 1 h. The crystalline, and structural observations revealed the existence of SiC and SiO{sub 2} phases, which noticeably confirmed the formation of SiC–SiO{sub 2} nanocomposite. The SiC–SiO{sub 2} layer on Si solar cells was found to be an excellent AR coating, exhibiting the low reflectance of 7.08% at wavelengths ranging from 400 to 1000 nm. The fabricated crystalline Si solar cell with SiC–SiO{sub 2} nanocomposite AR coating showed comparable power conversion efficiency of 16.99% to the conventional Si{sub x}N{sub x} AR coated Si solar cell. New and effective sol–gel derived SiC–SiO{sub 2} AR layer would offer a promising technique to produce high performance Si solar cells with low-cost.

  11. Thermal Hysteresis of MEMS Packaged Capacitive Pressure Sensor (CPS) Based 3C-SiC

    Science.gov (United States)

    Marsi, N.; Majlis, B. Y.; Mohd-Yasin, F.; Hamzah, A. A.; Mohd Rus, A. Z.

    2016-11-01

    Presented herein are the effects of thermal hysteresis analyses of the MEMS packaged capacitive pressure sensor (CPS). The MEMS CPS was employed on Si-on-3C-SiC wafer that was performed using the hot wall low-pressure chemical vapour deposition (LPCVD) reactors at the Queensland Micro and Nanotechnology Center (QMNC), Griffith University and fabricated using the bulk-micromachining process. The MEMS CPS was operated at an extreme temperature up to 500°C and high external pressure at 5.0 MPa. The thermal hysteresis phenomenon that causes the deflection, strain and stress on the 3C-SiC diaphragm spontaneously influence the MEMS CPS performances. The differences of temperature, hysteresis, and repeatability test were presented to demonstrate the functionality of the MEMS packaged CPS. As expected, the output hysteresis has a low hysteresis (less than 0.05%) which has the hardness greater than the traditional silicon. By utilizing this low hysteresis, it was revealed that the MEMS packaged CPS has high repeatability and stability of the sensor.

  12. Allylhydridopolycarbosilane (AHPCS) as matrix resin for C/SiC ceramic matrix composites

    Energy Technology Data Exchange (ETDEWEB)

    Sreeja, R. [Ceramic Matrix Products Division, Propellants and Special Chemicals Group, PCM Entity, Vikram Sarabhai Space Center, Thiruvananthapuram 695022 (India); Swaminathan, B., E-mail: swami1423@gmail.co [Ceramic Matrix Products Division, Propellants and Special Chemicals Group, PCM Entity, Vikram Sarabhai Space Center, Thiruvananthapuram 695022 (India); Painuly, Anil; Sebastian, T.V.; Packirisamy, S. [Ceramic Matrix Products Division, Propellants and Special Chemicals Group, PCM Entity, Vikram Sarabhai Space Center, Thiruvananthapuram 695022 (India)

    2010-04-15

    In present study, partially allyl-substituted hydridopolycarbosilane (5 mol% allyl) [AHPCS] has been characterized by spectral techniques and thermal analysis. The DSC studies show that, the polymer is self-cross-linking at lower temperatures without any incorporation of cross-linking agents. The spectral and thermal characterizations carried out at different processing stages indicate the possibility of extensive structural rearrangement accompanied by the loss of hydrogen and other reactions of C and Si containing species resulting in the conversion of the branched chain segment into a 3D SiC network structure. AHPCS gave ceramic residue of 72% and 70% at 900 and 1500 deg. C respectively in argon atmosphere. XRD pattern of 1500 deg. C heat-treated AHPCS, indicates the formation of silicon carbide with the particle size of 3-4 nm. AHPCS was used as matrix resin for the preparation of C/SiC composite without any interfacial coating over the T-300 carbon fabric reinforcement. Flexural strength value of 74-86 MPa for C/SiC specimen with density of 1.7 g/cm{sup 3} was obtained after four infiltration and pyrolysis cycles.

  13. Grain growth of nanocrystalline 3C-SiC under Au ion irradiation at elevated temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Limin; Jiang, Weilin; Dissanayake, Amila C.; Varga, Tamas; Zhang, Jiandong; Zhu, Zihua; Hu, Dehong; Wang, Haiyan; Henager, Charles H.; Wang, Tieshan

    2016-01-09

    Nanocrystalline silicon carbide (SiC) represents an excellent model system for a fundamental study of interfacial (grain boundary) processes under nuclear radiation, which are critical to the understanding of the response of nanostructured materials to high-dose irradiation. This study reports on a comparison of irradiation effects in cubic phase SiC (3C-SiC) grains of a few nanometers in size and single-crystal 3C-SiC films under identical Au ion irradiation to a range of doses at 700 K. In contrast to the latter, in which lattice disorder is accumulated to a saturation level without full amorphization, the average grain size of the former increases with dose following a power-law trend. In addition to coalescence, the grain grows through atomic jumps and mass transport, where irradiation induced vacancies at grain boundaries assist the processes. It is found that a higher irradiation temperature leads to slower grain growth and a faster approach to a saturation size of SiC nanograins. The results could potentially have a positive impact on structural components of advanced nuclear energy systems.

  14. Tribological properties of C/C-SiC composites for brake discs

    Science.gov (United States)

    Jang, G. H.; Cho, K. H.; Park, S. B.; Lee, W. G.; Hong, U. S.; Jang, H.

    2010-02-01

    This study examines the friction and wear of ceramic matrix composites designed for use in automotive brake discs. The composites are produced by reinforcing a SiC matrix with carbon fibers using a liquid silicon infiltration method. C/C-SiC composites with two different compositions are fabricated to examine the compositional effect on the tribological properties. The tribological properties are evaluated using a scale dynamometer with a low-steel type friction material. The results show that the coefficient of friction is determined by the composition of the composite, which affects the propensity of friction film formation on the disc surface. A stable friction film on the disc surface also improves the wear resistance by diminishing the abrasive action of the disc. On the other hand, the friction film formation on the disc is affected by the applied pressure, and stable films are obtained at high pressures. This trend is prominent with discs with high Si content. However, both C/C/-SiC composites show superior performance in terms of the friction force oscillation, which is closely related to brake-induced vibration.

  15. Influence of Constituents on Creep Properties of SiC/SiC Composites

    Science.gov (United States)

    Bhatt, R.; DiCarlo, J.

    2016-01-01

    SiC-SiC composites are being considered as potential candidate materials for next generation turbine components such as combustor liners, nozzle vanes and blades because of their low density, high temperature capability, and tailorable mechanical properties. These composites are essentially fabricated by infiltrating matrix into a stacked array of fibers or fiber preform by one or a combination of manufacturing methods such as, Melt Infiltration (MI) of molten silicon metal, Chemical Vapor Infiltration (CVI), Polymer Infiltration and Pyrolysis (PIP). To understand the influence of constituents, the SiC-SiC composites fabricated by MI, CVI, and PIP methods were creep tested in air between 12000 and 14500 degrees Centigrade for up to 500 hours. The failed specimens were analyzed under a scanning electron microscope to assess damage mechanisms. Also, knowing the creep deformation parameters of the fiber and the matrix under the testing conditions, the creep behavior of the composites was modeled and compared with the measured data. The implications of the results on the long term durability of these composites will be discussed.

  16. High-performance a -Si/c-Si heterojunction photoelectrodes for photoelectrochemical oxygen and hydrogen evolution

    KAUST Repository

    Wang, Hsin Ping

    2015-05-13

    Amorphous Si (a-Si)/crystalline Si (c-Si) heterojunction (SiHJ) can serve as highly efficient and robust photoelectrodes for solar fuel generation. Low carrier recombination in the photoelectrodes leads to high photocurrents and photovoltages. The SiHJ was designed and fabricated into both photoanode and photocathode with high oxygen and hydrogen evolution efficiency, respectively, by simply coating of a thin layer of catalytic materials. The SiHJ photoanode with sol-gel NiOx as the catalyst shows a current density of 21.48 mA/cm2 at the equilibrium water oxidation potential. The SiHJ photocathode with 2 nm sputter-coated Pt catalyst displays excellent hydrogen evolution performance with an onset potential of 0.640 V and a solar to hydrogen conversion efficiency of 13.26%, which is the highest ever reported for Si-based photocathodes. © 2015 American Chemical Society.

  17. First-principles studies of di-arsenic interstitial and its implications for arsenic-interstitial diffusion in crystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Yonghyun [Microelectronics Research Center, University of Texas at Austin, Austin, TX 78758 (United States); Kirichenko, Taras A. [Freescale Semiconductor Inc., 3501 Ed Bluestein Blvd., Austin, TX 78721 (United States); Kong, Ning [Microelectronics Research Center, University of Texas at Austin, Austin, TX 78758 (United States); Larson, Larry [SEMATECH, 2706 Montopolis Drive., Austin, TX 78741 (United States); Banerjee, Sanjay K. [Microelectronics Research Center, University of Texas at Austin, Austin, TX 78758 (United States)], E-mail: banerjee@ece.utexas.edu

    2007-12-15

    We propose new structural configurations and novel diffusion mechanisms for neutral di-arsenic interstitial (As{sub 2}I{sub 2}) in silicon with a first-principle density functional theory simulation within the generalized gradient approximation. With an assumption of excess silicon interstitials and high arsenic concentrations, neutral As{sub 2}I{sub 2} is expected to be favorable and mobile with low-migration barrier. Moreover, because the diffusion barrier of arsenic interstitial pairs (AsI) is very low (< 0.2 eV) under the same conditions, As{sub 2}I{sub 2} can be easily formed and likely intermediate stage of larger arsenic interstitial clusters.

  18. Quantification of Power Losses of the Interdigitated Metallization of Crystalline Silicon Thin-Film Solar Cells on Glass

    Directory of Open Access Journals (Sweden)

    Peter J. Gress

    2012-01-01

    Full Text Available The metallization grid pattern is one of the most important design elements for high-efficiency solar cells. This paper presents a model based on the unit cell approach to accurately quantify the power losses of a specialized interdigitated metallization scheme for polycrystalline silicon thin-film solar cells on glass superstrates. The sum of the power losses can be minimized to produce an optimized grid-pattern design for a cell with specific parameters. The model is simulated with the standard parameters of a polycrystalline silicon solar cell, and areas for efficiency improvements are identified, namely, a reduction in emitter finger widths and a shift toward series-interconnected, high-voltage modules with very small cell sizes. Using the model to optimize future grid-pattern designs, higher cell and module efficiencies of such devices can be achieved.

  19. SEMICONDUCTOR TECHNOLOGY Texturization of mono-crystalline silicon solar cells in TMAH without the addition of surfactant

    Science.gov (United States)

    Weiying, Ou; Yao, Zhang; Hailing, Li; Lei, Zhao; Chunlan, Zhou; Hongwei, Diao; Min, Liu; Weiming, Lu; Jun, Zhang; Wenjing, Wang

    2010-10-01

    Etching was performed on (100) silicon wafers using silicon-dissolved tetramethylammonium hydroxide (TMAH) solutions without the addition of surfactant. Experiments were carried out in different TMAH concentrations at different temperatures for different etching times. The surface phenomena, etching rates, surface morphology and surface reflectance were analyzed. Experimental results show that the resulting surface covered with uniform pyramids can be realized with a small change in etching rates during the etching process. The etching mechanism is explained based on the experimental results and the theoretical considerations. It is suggested that all the components in the TMAH solutions play important roles in the etching process. Moreover, TMA+ ions may increase the wettability of the textured surface. A good textured surface can be obtained in conditions where the absorption of OH-/H2O is in equilibrium with that of TMA+/SiO2 (OH)22-.

  20. Quantification of Power Losses of the Interdigitated Metallization of Crystalline Silicon Thin-Film Solar Cells on Glass

    OpenAIRE

    Gress, Peter J.; Sergey Varlamov

    2012-01-01

    The metallization grid pattern is one of the most important design elements for high-efficiency solar cells. This paper presents a model based on the unit cell approach to accurately quantify the power losses of a specialized interdigitated metallization scheme for polycrystalline silicon thin-film solar cells on glass superstrates. The sum of the power losses can be minimized to produce an optimized grid-pattern design for a cell with specific parameters. The model is simulated with the stan...