Submillimeter Spectroscopic Study of Semiconductor Processing Plasmas

Science.gov (United States)

Helal, Yaser H.

Plasmas used for manufacturing processes of semiconductor devices are complex and challenging to characterize. The development and improvement of plasma processes and models rely on feedback from experimental measurements. Current diagnostic methods are not capable of measuring absolute densities of plasma species with high resolution without altering the plasma, or without input from other measurements. At pressures below 100 mTorr, spectroscopic measurements of rotational transitions in the submillimeter/terahertz (SMM) spectral region are narrow enough in relation to the sparsity of spectral lines that absolute specificity of measurement is possible. The frequency resolution of SMM sources is such that spectral absorption features can be fully resolved. Processing plasmas are a similar pressure and temperature to the environment used to study astrophysical species in the SMM spectral region. Many of the molecular neutrals, radicals, and ions present in processing plasmas have been studied in the laboratory and their absorption spectra have been cataloged or are in the literature for the purpose of astrophysical study. Recent developments in SMM devices have made its technology commercially available for applications outside of specialized laboratories. The methods developed over several decades in the SMM spectral region for these laboratory studies are directly applicable for diagnostic measurements in the semiconductor manufacturing industry. In this work, a continuous wave, intensity calibrated SMM absorption spectrometer was developed as a remote sensor of gas and plasma species. A major advantage of intensity calibrated rotational absorption spectroscopy is its ability to determine absolute concentrations and temperatures of plasma species from first principles without altering the plasma environment. An important part of this work was the design of the optical components which couple 500 - 750 GHz radiation through a commercial inductively coupled plasma

Diamond deposition using a planar radio frequency inductively coupled plasma

Science.gov (United States)

Bozeman, S. P.; Tucker, D. A.; Stoner, B. R.; Glass, J. T.; Hooke, W. M.

1995-06-01

A planar radio frequency inductively coupled plasma has been used to deposit diamond onto scratched silicon. This plasma source has been developed recently for use in large area semiconductor processing and holds promise as a method for scale up of diamond growth reactors. Deposition occurs in an annulus which coincides with the area of most intense optical emission from the plasma. Well-faceted diamond particles are produced when the substrate is immersed in the plasma.

ICRH antenna S-matrix measurements and plasma coupling characterisation at JET

Science.gov (United States)

Monakhov, I.; Jacquet, P.; Blackman, T.; Bobkov, V.; Dumortier, P.; Helou, W.; Lerche, E.; Kirov, K.; Milanesio, D.; Maggiora, R.; Noble, C.; Contributors, JET

2018-04-01

The paper is dedicated to the characterisation of multi-strap ICRH antenna coupling to plasma. Relevance of traditional concept of coupling resistance to antennas with mutually coupled straps is revised and the importance of antenna port excitation consistency for application of the concept is highlighted. A method of antenna S-matrix measurement in presence of plasma is discussed allowing deeper insight into the problem of antenna-plasma coupling. The method is based entirely on the RF plant hardware and control facilities available at JET and it involves application of variable phasing between the antenna straps during the RF plant operations at  >100 kW. Unlike traditional techniques relying on low-power (~10 mW) network analysers, the applied antenna voltage amplitudes are relevant to practical conditions of ICRH operations; crucially, they are high enough to minimise possible effects of antenna loading non-linearity due to the RF sheath effects and other phenomena which could affect low-power measurements. The method has been successfully applied at JET to conventional 4-port ICRH antennas energised at frequencies of 33 MHz, 42 MHz and 51 MHz during L-mode plasma discharges while different gas injection modules (GIMs) were used to maintain comparable plasma densities during the pulses. The S-matrix assessment and its subsequent processing yielding ‘global’ antenna coupling resistances in conditions of equalised port maximum voltages allowed consistent description of antenna coupling to plasma at different strap phasing, operational frequencies and applied GIMs. Comprehensive experimental characterisation of mutually coupled antenna straps in presence of plasma also provided a unique opportunity for in-depth verification of TOPICA computer simulations.

Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing

International Nuclear Information System (INIS)

Chang, C.-H.; Leou, K.-C.; Lin Chaung; Lin, T.-L.; Tseng, C.-W.; Tsai, C.-H.

2003-01-01

In this study, we have experimentally demonstrated the real-time closed-loop control of both ion density and ion energy in a chlorine inductively coupled plasma etcher. To measure positive ion density, the trace rare gases-optical emission spectroscopy is used to measure the chlorine positive ion density. An rf voltage probe is adopted to measure the root-mean-square rf voltage on the electrostatic chuck which is linearly dependent on sheath voltage. One actuator is a 13.56 MHz rf generator to drive the inductive coil seated on a ceramic window. The second actuator is also a 13.56 MHz rf generator to power the electrostatic chuck. The closed-loop controller is designed to compensate for process drift, process disturbance, and pilot wafer effect and to minimize steady-state error of plasma parameters. This controller has been used to control the etch process of unpatterned polysilicon. The experimental results showed that the closed-loop control had a better repeatability of plasma parameters compared with open-loop control. The closed-loop control can eliminate the process disturbance resulting from reflected power. In addition, experimental results also demonstrated that closed-loop control has a better reproducibility in etch rate as compared with open-loop control

LLNL large-area inductively coupled plasma (ICP) source: Experiments

International Nuclear Information System (INIS)

Richardson, R.A.; Egan, P.O.; Benjamin, R.D.

1995-05-01

We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N 2 over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B probes as well as electrical circuit measurements. The B and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable

Some remarks on coherent nonlinear coupling of waves in plasmas

International Nuclear Information System (INIS)

Wilhelmsson, H.

1976-01-01

The analysis of nonlinear processes in plasma physics has given rise to a basic set of coupled equations. These equations describe the coherent nonlinear evolution of plasma waves. In this paper various possibilities of analysing these equations are discussed and inherent difficulties in the description of nonlinear interactions between different types of waves are pointed out. Specific examples of stimulated excitation of waves are considered. These are the parametric excitation of hybrid resonances in hot magnetized multi-ion component plasma and laser-plasma interactions. (B.D.)

Coupling of Plasmas and Liquids

Science.gov (United States)

Lindsay, Alexander David

Plasma-liquids have exciting applications to several important socioeconomic areas, including agriculture, water treatment, and medicine. To realize their application potential, the basic physical and chemical phenomena of plasma-liquid systems must be better understood. Additionally, system designs must be optimized in order to maximize fluxes of critical plasma species to the liquid phase. With objectives to increase understanding of these systems and optimize their applications, we have performed both comprehensive modeling and experimental work. To date, models of plasma-liquids have focused on configurations where diffusion is the dominant transport process in both gas and liquid phases. However, convection plays a key role in many popular plasma source designs, including jets, corona discharges, and torches. In this dissertation, we model momentum, heat, and neutral species mass transfer in a convection-dominated system based on a corona discharge. We show that evaporative cooling produced by gas-phase convection can lead to a significant difference between gas and liquid phase bulk temperatures. Additionally, convection induced in the liquid phase by the gas phase flow substantially increases interfacial mass transfer of hydrophobic species like NO and NO2. Finally, liquid kinetic modeling suggests that concentrations of highly reactive species like OH and ONOOH are several orders of magnitude higher at the interface than in the solution bulk. Subsequent modeling has focused on coupling discharge physics with species transport at and through the interface. An assumption commonly seen in the literature is that interfacial loss coefficients of charged species like electrons are equal to unity. However, there is no experimental evidence to either deny or support this assumption. Without knowing the true interfacial behavior of electrons, we have explored the effects on key plasma-liquid variables of varying interfacial parameters like the electron and energy

Effects of weakly coupled and dense quantum plasmas environments on charge exchange and ionization processes in Na+ + Rb(5s) atom collisions

Science.gov (United States)

Pandey, Mukesh Kumar; Lin, Yen-Chang; Ho, Yew Kam

2017-02-01

The effects of weakly coupled or classical and dense quantum plasmas environment on charge exchange and ionization processes in Na+ + Rb(5s) atom collision at keV energy range have been investigated using classical trajectory Monte Carlo (CTMC) method. The interaction of three charged particles are described by the Debye-Hückel screen potential for weakly coupled plasma, whereas exponential cosine-screened Coulomb potential have been used for dense quantum plasma environment and the effects of both conditions on the cross sections are compared. It is found that screening effects on cross sections in high Debye length condition is quite small in both plasma environments. However, enhanced screening effects on cross sections are observed in dense quantum plasmas for low Debye length condition, which becomes more effective while decreasing the Debye length. Also, we have found that our calculated results for plasma-free case are comparable with the available theoretical results. These results are analyzed in light of available theoretical data with the choice of model potentials.

Titanium oxidation by rf inductively coupled plasma

International Nuclear Information System (INIS)

Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

2014-01-01

The development of titanium dioxide (TiO 2 ) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10 −2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ∼5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy

Numerical experiments on 2D strongly coupled complex plasmas

International Nuclear Information System (INIS)

Hou Lujing; Ivlev, A V; Thomas, H M; Morfill, G E

2010-01-01

The Brownian Dynamics simulation method is briefly reviewed at first and then applied to study some non-equilibrium phenomena in strongly coupled complex plasmas, such as heat transfer processes, shock wave excitation/propagation and particle trapping, by directly mimicking the real experiments.

Ion sampling and transport in Inductively Coupled Plasma Mass Spectrometry

Science.gov (United States)

Farnsworth, Paul B.; Spencer, Ross L.

2017-08-01

Quantitative accuracy and high sensitivity in inductively coupled plasma mass spectrometry (ICP-MS) depend on consistent and efficient extraction and transport of analyte ions from an inductively coupled plasma to a mass analyzer, where they are sorted and detected. In this review we examine the fundamental physical processes that control ion sampling and transport in ICP-MS and compare the results of theory and computerized models with experimental efforts to characterize the flow of ions through plasma mass spectrometers' vacuum interfaces. We trace the flow of ions from their generation in the plasma, into the sampling cone, through the supersonic expansion in the first vacuum stage, through the skimmer, and into the ion optics that deliver the ions to the mass analyzer. At each stage we consider idealized behavior and departures from ideal behavior that affect the performance of ICP-MS as an analytical tool.

Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

International Nuclear Information System (INIS)

Tang, Deli; Chu, Paul K.

2003-01-01

The enhancement of planar radio frequency (RF) inductively coupled argon plasma is studied in the presence of an assistant anode and an external magnetic field at low pressure. The influence of the assistant anode and magnetic field on the efficiency of RF power absorption and plasma parameters is investigated. An external axial magnetic field is coupled into the plasma discharge region by an external electromagnetic coil outside the discharge chamber and an assistant cylindrical anode is inserted into the discharge chamber to enhance the plasma discharge. The plasma parameters and density profile are measured by an electrostatic Langmuir probe at different magnetic fields and anode voltages. The RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge. The plasma density can be further increased by the application of a voltage to the assistant anode. Owing to the effective power absorption and enhanced plasma discharge by the assistant anode in a longitudinal magnetic field, the plasma density can be enhanced by more than a factor of two. Meanwhile, the nonuniformity of the plasma density is less than 10% and it can be achieved in a process chamber with a diameter of 600 mm

Self-consistent simulation study on magnetized inductively coupled plasma for 450 mm semiconductor wafer processing

International Nuclear Information System (INIS)

Lee, Ho-Jun; Kim, Yun-Gi

2012-01-01

The characteristics of weakly magnetized inductively coupled plasma (MICP) are investigated using a self-consistent simulation based on the drift–diffusion approximation with anisotropic transport coefficients. MICP is a plasma source utilizing the cavity mode of the low-frequency branch of the right-hand circularly polarized wave. The model system is 700 mm in diameter and has a 250 mm gap between the radio-frequency window and wafer holder. The model chamber size is chosen to verify the applicability of this type of plasma source to the 450 mm wafer process. The effects of electron density distribution and external axial magnetic field on the propagation properties of the plasma wave, including the wavelength modulation and refraction toward the high-density region, are demonstrated. The restricted electron transport and thermal conductivity in the radial direction due to the magnetic field result in small temperature gradient along the field lines and off-axis peak density profile. The calculated impedance seen from the antenna terminal shows that MICP has a resistance component that is two to threefold higher than that of ICP. This property is practically important for large-size, low-pressure plasma sources because high resistance corresponds to high power-transfer efficiency and stable impedance matching characteristics. For the 0.665 Pa argon plasma, MICP shows a radial density uniformity of 6% within 450 mm diameter, which is much better than that of nonmagnetized ICP.

Harmonic emission due to the nonlinear coupling of a Gaussian laser and a plasma wave

Energy Technology Data Exchange (ETDEWEB)

Pathak, R; Jain, R K [Department of Mathematics, SSL Jain College, Vidisha, MP, 464001 (India); Parashar, J [Department of Physics, Samrat Ashok Technological Institute, Vidisha, MP, 464001 (India)

2010-04-15

A high-power Gaussian laser propagating through a plasma couples with a large-amplitude plasma wave and undergoes scattering to produce harmonics. The process is sensitive to the phase matching angle between the laser and plasma wave numbers and the plasma wave frequency. For larger harmonics, the phase matching angle is high. The efficiency of the process is comparatively high at higher plasma wave frequencies.

Shear viscosities of photons in strongly coupled plasmas

Directory of Open Access Journals (Sweden)

Di-Lun Yang

2016-09-01

Full Text Available We investigate the shear viscosity of thermalized photons in the quark gluon plasma (QGP at weak coupling and N=4 super Yang–Mills plasma (SYMP at both strong and weak couplings. We find that the shear viscosity due to the photon–parton scattering up to the leading order of electromagnetic coupling is suppressed when the coupling of the QGP/SYMP is increased, which stems from the blue-shift of the thermal-photon spectrum at strong coupling. In addition, the shear viscosity rapidly increases near the deconfinement transition in a phenomenological model analogous to the QGP.

Energy coupling in the plasma focus

International Nuclear Information System (INIS)

Wainwright, T.E.; Pickles, W.L.; Sahlin, H.L.; Price, D.F.

1979-01-01

Experiments have been performed with a 125-kJ plasma focus to investigate mechanisms for rapid coupling of inductively-stored energy into plasmas. The coupling can take place through the formation of an electron or ion beam that deposits its energy in a target or directly by the penetration of the magnetic field into a resistive plasma. Some preliminary results from experiments of both types are described. The experiments use a replaceable conical anode tip that is intended to guide the focus to within a few millimeters of the axis, where it can suddenly deliver energy either to a small target or to particles that are accelerated. X-ray and fast-ion diagnostics have been used to study the effects

Electrostatic double layers and a plasma evacuation process

International Nuclear Information System (INIS)

Raadu, M.A.; Carlqvist, P.

1979-12-01

An evacuation process due to the growth of current driven instabilities in a plasma is discussed. The process, which leads to localized extreme density reductions, is related to the formation of electrostatic double layers. The initial linear phase is treated using the superposition of unstable plasma waves. In the long wave length, non-dispersive limit a density dip, which is initially present as a small disturbance, grows rapidly and remains localized in the plasma. The process works for a variety of plasma conditions provided a certain current density is exceeded. For a particular choice of plasma parameters the non-linear development is followed, by solving the coupled Vlasov-Poisson equations by finite difference methods. The evacuation process is found to work even more effectively in the non-linear phase and leads to an extreme density reduction within the dip. It is suggested that the growth of such structures produces weak points within the plasma that can lead to the formation of double layers. (Auth.)

The effect of dielectric top lids on materials processing in a low frequency inductively coupled plasma (LF-ICP) reactor

International Nuclear Information System (INIS)

Lim, J.W.M.; Chan, C.S.; Xu, L.; Xu, S.

2014-01-01

The advent of the plasma revolution began in the 1970's with the exploitation of plasma sources for anisotropic etching and processing of materials. In recent years, plasma processing has gained popularity, with research institutions adopting projects in the field and industries implementing dry processing in their production lines. The advantages of utilizing plasma sources would be uniform processing over a large exposed surface area, and the reduction of toxic emissions. This leads to reduced costs borne by manufacturers which could be passed down as consumer savings, and a reduction in negative environmental impacts. Yet, one constraint that plagues the industry would be the control of contaminants in a plasma reactor which becomes evident when reactions are conducted in a clean vacuum environment. In this work, amorphous silicon (a-Si) thin films were grown on glass substrates in a low frequency inductively coupled plasma (LF-ICP) reactor with a top lid made of quartz. Even though the chamber was kept at high vacuum (~10 −4 Pa), it was evident through secondary ion mass spectroscopy (SIMS) and Fourier-transform infra-red spectroscopy (FTIR) that oxygen contaminants were present. With the aid of optical emission spectroscopy (OES) the contaminant species were identified. The design of the LF-ICP reactor was then modified to incorporate an Alumina (Al 2 O 3 ) lid. Results indicate that there were reduced amounts of contaminants present in the reactor, and that an added benefit of increased power transfer to the plasma, improving deposition rate of thin films was realized. The results of this study is conclusive in showing that Al 2 O 3 is a good alternative as a top-lid of an LF-ICP reactor, and offers industries a solution in improving quality and rate of growth of thin films. (author)

Fundamental Processes in Plasmas. Final report

International Nuclear Information System (INIS)

O'Neil, Thomas M.; Driscoll, C. Fred

2009-01-01

This research focuses on fundamental processes in plasmas, and emphasizes problems for which precise experimental tests of theory can be obtained. Experiments are performed on non-neutral plasmas, utilizing three electron traps and one ion trap with a broad range of operating regimes and diagnostics. Theory is focused on fundamental plasma and fluid processes underlying collisional transport and fluid turbulence, using both analytic techniques and medium-scale numerical simulations. The simplicity of these systems allows a depth of understanding and a precision of comparison between theory and experiment which is rarely possible for neutral plasmas in complex geometry. The recent work has focused on three areas in basic plasma physics. First, experiments and theory have probed fundamental characteristics of plasma waves: from the low-amplitude thermal regime, to inviscid damping and fluid echoes, to cold fluid waves in cryogenic ion plasmas. Second, the wide-ranging effects of dissipative separatrices have been studied experimentally and theoretically, finding novel wave damping and coupling effects and important plasma transport effects. Finally, correlated systems have been investigated experimentally and theoretically: UCSD experients have now measured the Salpeter correlation enhancement, and theory work has characterized the 'guiding center atoms of antihydrogen created at CERN

Monitoring non-thermal plasma processes for nanoparticle synthesis

Science.gov (United States)

Mangolini, Lorenzo

2017-09-01

Process characterization tools have played a crucial role in the investigation of dusty plasmas. The presence of dust in certain non-thermal plasma processes was first detected by laser light scattering measurements. Techniques like laser induced particle explosive evaporation and ion mass spectrometry have provided the experimental evidence necessary for the development of the theory of particle nucleation in silane-containing non-thermal plasmas. This review provides first a summary of these early efforts, and then discusses recent investigations using in situ characterization techniques to understand the interaction between nanoparticles and plasmas. The advancement of such monitoring techniques is necessary to fully develop the potential of non-thermal plasmas as unique materials synthesis and processing platforms. At the same time, the strong coupling between materials and plasma properties suggest that it is also necessary to advance techniques for the measurement of plasma properties while in presence of dust. Recent progress in this area will be discussed.

Feedback control of chlorine inductively coupled plasma etch processing

International Nuclear Information System (INIS)

Lin Chaung; Leou, K.-C.; Shiao, K.-M.

2005-01-01

Feedback control has been applied to poly-Si etch processing using a chlorine inductively coupled plasma. Since the positive ion flux and ion energy incident upon the wafer surface are the key factors that influence the etch rate, the ion current and the root mean square (rms) rf voltage on the wafer stage, which are measured using an impedance meter connected to the wafer stage, are adopted as the controlled variables to enhance etch rate. The actuators are two 13.56 MHz rf power generators, which adjust ion density and ion energy, respectively. The results of closed-loop control show that the advantages of feedback control can be achieved. For example, with feedback control, etch rate variation under the transient chamber wall condition is reduced roughly by a factor of 2 as compared to the open-loop case. In addition, the capability of the disturbance rejection was also investigated. For a gas pressure variation of 20%, the largest etch rate variation is about 2.4% with closed-loop control as compared with as large as about 6% variation using open-loop control. Also the effect of ion current and rms rf voltage on etch rate was studied using 2 2 factorial design whose results were used to derive a model equation. The obtained formula was used to adjust the set point of ion current and rf voltage so that the desired etch rate was obtained

Effective potential kinetic theory for strongly coupled plasmas

Science.gov (United States)

Baalrud, Scott D.; Daligault, Jérôme

2016-11-01

The effective potential theory (EPT) is a recently proposed method for extending traditional plasma kinetic and transport theory into the strongly coupled regime. Validation from experiments and molecular dynamics simulations have shown it to be accurate up to the onset of liquid-like correlation parameters (corresponding to Γ ≃ 10-50 for the one-component plasma, depending on the process of interest). Here, this theory is briefly reviewed along with comparisons between the theory and molecular dynamics simulations for self-diffusivity and viscosity of the one-component plasma. A number of new results are also provided, including calculations of friction coefficients, energy exchange rates, stopping power, and mobility. The theory is also cast in the Landau and Fokker-Planck kinetic forms, which may prove useful for enabling efficient kinetic computations.

Energy coupling to the plasma in repetitive nanosecond pulse discharges

International Nuclear Information System (INIS)

Adamovich, Igor V.; Nishihara, Munetake; Choi, Inchul; Uddi, Mruthunjaya; Lempert, Walter R.

2009-01-01

A new analytic quasi-one-dimensional model of energy coupling to nanosecond pulse discharge plasmas in plane-to-plane geometry has been developed. The use of a one-dimensional approach is based on images of repetitively pulsed nanosecond discharge plasmas in dry air demonstrating that the plasma remains diffuse and uniform on a nanosecond time scale over a wide range of pressures. The model provides analytic expressions for the time-dependent electric field and electron density in the plasma, electric field in the sheath, sheath boundary location, and coupled pulse energy. The analytic model predictions are in very good agreement with numerical calculations. The model demonstrates that (i) the energy coupled to the plasma during an individual nanosecond discharge pulse is controlled primarily by the capacitance of the dielectric layers and by the breakdown voltage and (ii) the pulse energy coupled to the plasma during a burst of nanosecond pulses decreases as a function of the pulse number in the burst. This occurs primarily because of plasma temperature rise and resultant reduction in breakdown voltage, such that the coupled pulse energy varies approximately proportionally to the number density. Analytic expression for coupled pulse energy scaling has been incorporated into the air plasma chemistry model, validated previously by comparing with atomic oxygen number density measurements in nanosecond pulse discharges. The results of kinetic modeling using the modified air plasma chemistry model are compared with time-resolved temperature measurements in a repetitively pulsed nanosecond discharge in air, by emission spectroscopy, and purely rotational coherent anti-Stokes Raman spectroscopy showing good agreement.

Coupling of laser energy into plasma channels

International Nuclear Information System (INIS)

Dimitrov, D. A.; Giacone, R. E.; Bruhwiler, D. L.; Busby, R.; Cary, J. R.; Geddes, C. G. R.; Esarey, E.; Leemans, W. P.

2007-01-01

Diffractive spreading of a laser pulse imposes severe limitations on the acceleration length and maximum electron energy in the laser wake field accelerator (LWFA). Optical guiding of a laser pulse via plasma channels can extend the laser-plasma interaction distance over many Rayleigh lengths. Energy efficient coupling of laser pulses into and through plasma channels is very important for optimal LWFA performance. Results from simulation parameter studies on channel guiding using the particle-in-cell (PIC) code VORPAL [C. Nieter and J. R. Cary, J. Comput. Phys. 196, 448 (2004)] are presented and discussed. The effects that density ramp length and the position of the laser pulse focus have on coupling into channels are considered. Moreover, the effect of laser energy leakage out of the channel domain and the effects of tunneling ionization of a neutral gas on the guided laser pulse are also investigated. Power spectral diagnostics were developed and used to separate pump depletion from energy leakage. The results of these simulations show that increasing the density ramp length decreases the efficiency of coupling a laser pulse to a channel and increases the energy loss when the pulse is vacuum focused at the channel entrance. Then, large spot size oscillations result in increased energy leakage. To further analyze the coupling, a differential equation is derived for the laser spot size evolution in the plasma density ramp and channel profiles are simulated. From the numerical solution of this equation, the optimal spot size and location for coupling into a plasma channel with a density ramp are determined. This result is confirmed by the PIC simulations. They show that specifying a vacuum focus location of the pulse in front of the top of the density ramp leads to an actual focus at the top of the ramp due to plasma focusing, resulting in reduced spot size oscillations. In this case, the leakage is significantly reduced and is negligibly affected by ramp length

Interstellar turbulence model : A self-consistent coupling of plasma and neutral fluids

International Nuclear Information System (INIS)

Shaikh, Dastgeer; Zank, Gary P.; Pogorelov, Nikolai

2006-01-01

We present results of a preliminary investigation of interstellar turbulence based on a self-consistent two-dimensional fluid simulation model. Our model describes a partially ionized magnetofluid interstellar medium (ISM) that couples a neutral hydrogen fluid to a plasma through charge exchange interactions and assumes that the ISM turbulent correlation scales are much bigger than the shock characteristic length-scales, but smaller than the charge exchange mean free path length-scales. The shocks have no influence on the ISM turbulent fluctuations. We find that nonlinear interactions in coupled plasma-neutral ISM turbulence are influenced substantially by charge exchange processes

Mode coupling of electron plasma waves

International Nuclear Information System (INIS)

Harte, J.A.

1975-01-01

The driven coupled mode equations are derived for a two fluid, unequal temperature (T/sub e/ much greater than T/sub i/) plasma in the one-dimensional, electrostatic model and applied to the coupling of electron plasma waves. It is assumed that the electron to ion mass ratio identical with m/sub e/M/sub i// much less than 1 and eta 2 /sub ko/k lambda/sub De/ less than 1 where eta 2 /sub ko/ is the pump wave's power normalized to the plasma thermal energy, k the mode wave number and lambda/sub De/ the electron Debye length. Terms up to quadratic in pump power are retained. The equations describe the linear plasma modes oscillating at the wave number k and at ω/sub ek/, the Bohn Gross frequency, and at Ω/sub k/, the ion acoustic frequency, subject to the damping rates ν/sub ek/ and ν/sub ik/ for electrons and ions and their interactions due to intense high frequency waves E/sub k//sup l/. n/sub o/ is the background density, n/sub ik/ the fluctuating ion density, ω/sub pe/ the plasma frequency

Nonlinear charge reduction effect in strongly coupled plasmas

International Nuclear Information System (INIS)

Sarmah, D; Tessarotto, M; Salimullah, M

2006-01-01

The charge reduction effect, produced by the nonlinear Debye screening of high-Z charges occurring in strongly coupled plasmas, is investigated. An analytic asymptotic expression is obtained for the charge reduction factor (f c ) which determines the Debye-Hueckel potential generated by a charged test particle. Its relevant parametric dependencies are analysed and shown to predict a strong charge reduction effect in strongly coupled plasmas

Collisional Thermalization in Strongly Coupled Ultracold Neutral Plasmas

Science.gov (United States)

2017-01-25

calculated collisions rates in a strongly coupled plasma. From Bannasch et al., PRL 109, 185008 (2012). DISTRIBUTION A: Distribution approved for public...applicability to other plasmas.) We use a Green- Kubo relation to extract the diffusion constant from our measurements of the relaxation towards...strongly coupled systems. Our measurements (data symbols) agree with numerical calculations (solid lines) from J. Daligault, PRL 108, 225004 (2012

Training course on inductively coupled plasma spectrometry - Note

Digital Repository Service at National Institute of Oceanography (India)

Valsangkar, A.B.

TRAINING COURSE ON INDUCTIVELY COUPLED PLASMA SPECTROMETRY In the present day geological, chemical, environmental and archaeological research activities, the Inductively Coupled Plasma (ICP) Spectrometry is established as a cost-effective multi... the knowledge and advances in the analytical tools and methodologies for the benefit of the research scholars as well as professionals. National Institute of Oceanography, A.B. VALSANGKAR Dona Paula - 403 004 slip tectonics playing a major role...

Experimental measurements of Helicon wave coupling in KSTAR plasmas

Energy Technology Data Exchange (ETDEWEB)

Kim, H. J.; Wi, H. H.; Wang, S. J.; Park, S. Y.; Jeong, J. H.; Han, J. W.; Kwak, J. G.; Oh, Y. K. [National Fusion Research Institute, Daejeon (Korea, Republic of); Chun, M. H.; Yu, I. H. [Pohang Accelerator Laboratory, Pohang (Korea, Republic of)

2016-05-15

KSTAR tokamak can be a good platform to test this current drive concept because it has adequate machine parameters. Furthermore, KSTAR will have high electron beta plasmas in near future with additional ECH power. In 2015 KSTAR experiments, low-power traveling wave antenna has been designed, fabricated and installed for helicon wave coupling tests in KSTAT plasmas. In 2016 KSTAR campaign, 200 kW klystron power will be combined using three coaxial hybrid couplers and three dummy loads. High power RF will be fed into the traveling wave antenna with two coaxial feeders through two dual disk windows and 6 inch coaxial transmission line system. Current status and plan for high power helicon wave current drive system in KSTAR will be presented. Mock-up TWA antenna installed at the KSTAR reveals high couplings in both L- and H-mode plasmas. The coupling can be easily controlled by radial outer gap without degradation of plasma confinement or local gas puffing with slight decrease of plasma confinement.

Stirring Strongly Coupled Plasma

CERN Document Server

Fadafan, Kazem Bitaghsir; Rajagopal, Krishna; Wiedemann, Urs Achim

2009-01-01

We determine the energy it takes to move a test quark along a circle of radius L with angular frequency w through the strongly coupled plasma of N=4 supersymmetric Yang-Mills (SYM) theory. We find that for most values of L and w the energy deposited by stirring the plasma in this way is governed either by the drag force acting on a test quark moving through the plasma in a straight line with speed v=Lw or by the energy radiated by a quark in circular motion in the absence of any plasma, whichever is larger. There is a continuous crossover from the drag-dominated regime to the radiation-dominated regime. In the crossover regime we find evidence for significant destructive interference between energy loss due to drag and that due to radiation as if in vacuum. The rotating quark thus serves as a model system in which the relative strength of, and interplay between, two different mechanisms of parton energy loss is accessible via a controlled classical gravity calculation. We close by speculating on the implicati...

Study on spatial distribution of plasma parameters in a magnetized inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Cheong, Hee-Woon; Lee, Woohyun; Kim, Ji-Won; Whang, Ki-Woong, E-mail: kwhang@snu.ac.kr [Plasma Laboratory, Inter-University Semiconductor Research Center, Department of Electrical and Computer Engineering, Seoul National University, Seoul 151-742 (Korea, Republic of); Kim, Hyuk [Samsung Electronics Co., Banwol-dong, Hwaseong 445-701 (Korea, Republic of); Park, Wanjae [Tokyo Electron Miyagi Ltd., Taiwa-cho, Kurokawa-gun, Miyagi 981-3629 (Japan)

2015-07-15

Spatial distributions of various plasma parameters such as plasma density, electron temperature, and radical density in an inductively coupled plasma (ICP) and a magnetized inductively coupled plasma (M-ICP) were investigated and compared. Electron temperature in between the rf window and the substrate holder of M-ICP was higher than that of ICP, whereas the one just above the substrate holder of M-ICP was similar to that of ICP when a weak (<8 G) magnetic field was employed. As a result, radical densities in M-ICP were higher than those in ICP and the etch rate of oxide in M-ICP was faster than that in ICP without severe electron charging in 90 nm high aspect ratio contact hole etch.

Laser pulse propagation and enhanced energy coupling to fast electrons in dense plasma gradients

International Nuclear Information System (INIS)

Gray, R J; Carroll, D C; Yuan, X H; Brenner, C M; Coury, M; Quinn, M N; Tresca, O; McKenna, P; Burza, M; Wahlström, C-G; Lancaster, K L; Neely, D; Lin, X X; Li, Y T

2014-01-01

Laser energy absorption to fast electrons during the interaction of an ultra-intense (10 20 W cm −2 ), picosecond laser pulse with a solid is investigated, experimentally and numerically, as a function of the plasma density scale length at the irradiated surface. It is shown that there is an optimum density gradient for efficient energy coupling to electrons and that this arises due to strong self-focusing and channeling driving energy absorption over an extended length in the preformed plasma. At longer density gradients the laser filaments, resulting in significantly lower overall energy coupling. As the scale length is further increased, a transition to a second laser energy absorption process is observed experimentally via multiple diagnostics. The results demonstrate that it is possible to significantly enhance laser energy absorption and coupling to fast electrons by dynamically controlling the plasma density gradient. (paper)

Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases

Science.gov (United States)

Donkó, Z.; Derzsi, A.; Korolov, I.; Hartmann, P.; Brandt, S.; Schulze, J.; Berger, B.; Koepke, M.; Bruneau, B.; Johnson, E.; Lafleur, T.; Booth, J.-P.; Gibson, A. R.; O'Connell, D.; Gans, T.

2018-01-01

We discuss the origin of uncertainties in the results of numerical simulations of low-temperature plasma sources, focusing on capacitively coupled plasmas. These sources can be operated in various gases/gas mixtures, over a wide domain of excitation frequency, voltage, and gas pressure. At low pressures, the non-equilibrium character of the charged particle transport prevails and particle-based simulations become the primary tools for their numerical description. The particle-in-cell method, complemented with Monte Carlo type description of collision processes, is a well-established approach for this purpose. Codes based on this technique have been developed by several authors/groups, and have been benchmarked with each other in some cases. Such benchmarking demonstrates the correctness of the codes, but the underlying physical model remains unvalidated. This is a key point, as this model should ideally account for all important plasma chemical reactions as well as for the plasma-surface interaction via including specific surface reaction coefficients (electron yields, sticking coefficients, etc). In order to test the models rigorously, comparison with experimental ‘benchmark data’ is necessary. Examples will be given regarding the studies of electron power absorption modes in O2, and CF4-Ar discharges, as well as on the effect of modifications of the parameters of certain elementary processes on the computed discharge characteristics in O2 capacitively coupled plasmas.

Magnetic filter apparatus and method for generating cold plasma in semicoductor processing

Science.gov (United States)

Vella, Michael C.

1996-01-01

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.

Magnetic filter apparatus and method for generating cold plasma in semiconductor processing

Science.gov (United States)

Vella, M.C.

1996-08-13

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a ``cold plasma`` which is diffused in the region of the process surface while the ion implantation process takes place. 15 figs.

Radial Distribution Functions of Strongly Coupled Two-Temperature Plasmas

Science.gov (United States)

Shaffer, Nathaniel R.; Tiwari, Sanat Kumar; Baalrud, Scott D.

2017-10-01

We present tests of three theoretical models for the radial distribution functions (RDFs) in two-temperature strongly coupled plasmas. RDFs are useful in extending plasma thermodynamics and kinetic theory to strong coupling, but they are usually known only for thermal equilibrium or for approximate one-component model plasmas. Accurate two-component modeling is necessary to understand the impact of strong coupling on inter-species transport, e.g., ambipolar diffusion and electron-ion temperature relaxation. We demonstrate that the Seuferling-Vogel-Toeppfer (SVT) extension of the hypernetted chain equations not only gives accurate RDFs (as compared with classical molecular dynamics simulations), but also has a simple connection with the Yukawa OCP model. This connection gives a practical means to recover the structure of the electron background from knowledge of the ion-ion RDF alone. Using the model RDFs in Effective Potential Theory, we report the first predictions of inter-species transport coefficients of strongly coupled plasmas far from equilibrium. This work is supported by NSF Grant No. PHY-1453736, AFSOR Award No. FA9550-16-1-0221, and used XSEDE computational resources.

Helicon wave coupling to a chiral-plasma column

International Nuclear Information System (INIS)

Torres-Silva, H.; Reggiani, N.; Sakanaka, P.H.

1995-01-01

Inductive helicon wave coupling to a chiro-plasma column is studied numerically. In our theoretical model, the RF current distribution of the chiro-plasma is taken into account using the constitutive relations of a chiral-plasma. Computational results based on the data of present-day helicon devices are show. In particular, we discuss the role of magnetic-field-aligned electron landau damping for the helicon wave absorption. In many a see, the numerical findings can be understood reasonably in terms of the wavenumber spectra of the helicon wave dispersion relation for slow and fast wave of a chiral-plasma. In general however, the full electromagnetic treatment is necessary in order to describe and to understand the inductive coupling in the helicon wave regime. (author). 9 refs., 1 fig

Effect of single aerosol droplets on plasma impedance in the inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Chan, George C.-Y., E-mail: gcchan@indiana.edu; Zhu, Zhenli; Hieftje, Gary M.

2012-10-15

The impedance of an inductively coupled plasma was indirectly monitored by two different means-through a RF-probe coil placed inside the torch housing and from tapping the phase-detector signal of the impedance-matching network. During single-droplet introduction, temporal spikes in both the RF-probe coil and the phase-detector signals were readily observed, indicating a momentary change in plasma impedance. The changes in plasma impedance were found to be due solely to plasma perturbation by droplet introduction, and not to an artifact caused by imperfect automatic impedance matching. The temporal changes in plasma impedance were found to be directly proportional to the temporally integrated atomic emission of hydrogen, which is assumed in turn to be directly proportional to the volume of the introduced droplet. A small satellite droplet, with an estimated diameter of 27 {mu}m (i.e., {approx} 10 pL in volume), caused a readily measurable change in plasma impedance. By assuming that the change in RF-probe voltage is directly proportional to the variation in RF power delivered by the load coil, the instantaneous power change coupled to the plasma during single-droplet introduction was estimated. Typical increases in peak RF power and total energy coupled to the plasma, for a single 50-{mu}m droplet introduction, were thereby estimated to be around 8 to 11 W and 0.03 to 0.04 J, respectively. This impedance change was also exploited as a trigger to signal the droplet-introduction event into the plasma. This trigger signal was obtained through a combination of the RF-probe and the phase-detector signals and offered typical jitter from 1 to 2 ms. With the proper choice of a trigger threshold, no trigger misfire resulted and the achievable efficiencies of the trigger signal were 99.95, 97.18 and 74.33% for plasma forward power levels of 900, 1200, and 1500 W, respectively. The baseline noise on the RF-probe coil and the phase-detector signals, which increase with plasma

A Method to Construct Plasma with Nonlinear Density Enhancement Effect in Multiple Internal Inductively Coupled Plasmas

International Nuclear Information System (INIS)

Chen Zhipeng; Li Hong; Liu Qiuyan; Luo Chen; Xie Jinlin; Liu Wandong

2011-01-01

A method is proposed to built up plasma based on a nonlinear enhancement phenomenon of plasma density with discharge by multiple internal antennas simultaneously. It turns out that the plasma density under multiple sources is higher than the linear summation of the density under each source. This effect is helpful to reduce the fast exponential decay of plasma density in single internal inductively coupled plasma source and generating a larger-area plasma with multiple internal inductively coupled plasma sources. After a careful study on the balance between the enhancement and the decay of plasma density in experiments, a plasma is built up by four sources, which proves the feasibility of this method. According to the method, more sources and more intensive enhancement effect can be employed to further build up a high-density, large-area plasma for different applications. (low temperature plasma)

Hyperpolarizabilities of one and two electron ions under strongly coupled plasma

International Nuclear Information System (INIS)

Sen, Subhrangsu; Mandal, Puspajit; Kumar Mukherjee, Prasanta; Fricke, Burkhard

2013-01-01

Systematic investigations on the hyperpolarizabilities of hydrogen and helium like ions up to nuclear charge Z = 7 under strongly coupled plasma environment have been performed. Variation perturbation theory has been adopted to evaluate such properties for the one and two electron systems. For the two electron systems coupled Hartree-Fock theory, which takes care of partial electron correlation effects, has been utilised. Ion sphere model of the strongly coupled plasma, valid for ionic systems only, has been adopted for estimating the effect of plasma environment on the hyperpolarizability. The calculated free ion hyperpolarizability for all the systems is in good agreement with the existing data. Under confinement hyperpolarizabilities of one and two electron ions show interesting trend with respect to plasma coupling strength.

Analysis of plasma coupling with the prototype DIII-D ICRF antenna

International Nuclear Information System (INIS)

Ryan, P.M.; Hoffman, D.J.; Bigelow, T.S.; Baity, F.W.; Gardner, W.L.; Mayberry, M.J.; Rothe, K.E.

1988-01-01

Coupling to plasma in the H-mode is essential to the success of future ignited machines such as CIT. To ascertain voltage and current requirements for high-power second harmonic heating (2 MW in a 35- by 50-cm port), coupling to the DIII-D tokamak with a prototype compact loop antenna has been measured. The results show good loading for L-mode and limiter plasmas, but coupling 2 MW to an H-mode plasma demands voltages and currents near the limit of present technology. We report the technological analysis and progress that allow coupling of these power densities. 5 refs., 4 figs

Analysis of plasma coupling with the prototype DIII-D ICRF antenna

Energy Technology Data Exchange (ETDEWEB)

Ryan, P.M.; Hoffman, D.J.; Bigelow, T.S.; Baity, F.W.; Gardner, W.L.; Mayberry, M.J.; Rothe, K.E.

1988-01-01

Coupling to plasma in the H-mode is essential to the success of future ignited machines such as CIT. To ascertain voltage and current requirements for high-power second harmonic heating (2 MW in a 35- by 50-cm port), coupling to the DIII-D tokamak with a prototype compact loop antenna has been measured. The results show good loading for L-mode and limiter plasmas, but coupling 2 MW to an H-mode plasma demands voltages and currents near the limit of present technology. We report the technological analysis and progress that allow coupling of these power densities. 5 refs., 4 figs.

Electromagnetic modes in cold magnetized strongly coupled plasmas

OpenAIRE

Tkachenko, I. M.; Ortner, J.; Rylyuk, V. M.

1999-01-01

The spectrum of electromagnetic waves propagating in a strongly coupled magnetized fully ionized hydrogen plasma is found. The ion motion and damping being neglected, the influence of the Coulomb coupling on the electromagnetic spectrum is analyzed.

Energy Conservation Tests of a Coupled Kinetic-kinetic Plasma-neutral Transport Code

Energy Technology Data Exchange (ETDEWEB)

Stotler, D. P.; Chang, C. S.; Ku, S. H.; Lang, J.; Park, G.

2012-08-29

A Monte Carlo neutral transport routine, based on DEGAS2, has been coupled to the guiding center ion-electron-neutral neoclassical PIC code XGC0 to provide a realistic treatment of neutral atoms and molecules in the tokamak edge plasma. The DEGAS2 routine allows detailed atomic physics and plasma-material interaction processes to be incorporated into these simulations. The spatial pro le of the neutral particle source used in the DEGAS2 routine is determined from the uxes of XGC0 ions to the material surfaces. The kinetic-kinetic plasma-neutral transport capability is demonstrated with example pedestal fueling simulations.

Study on characteristics of coupled cavity chain filled with plasma

International Nuclear Information System (INIS)

Li Jianqing; Xiao Shu; Mo Yuanlong

2003-01-01

In this paper, by using rigorous field analysis, a coupled-cavity (CC) chain filled with plasma has been analyzed. How the hybrid wave between the cavity mode and plasma mode is formed has been studied. The periodical CC chain filled with plasma demonstrates periodical TG modes with a cutoff frequency of zero. When the plasma density increase to a large scale, the cavity mode of the CC chain overlaps the TG mode, these two modes couple with each other and form the hybrid modes. In the case of hybrid modes, the 'cold' bandwidth and the 'warm' bandwidth expand, and the coupled impedance increases about 5 times larger than that of the vacuum. As a whole, the slow wave characteristics are improved substantially due to the formation of the hybrid mode

Jeans instability of self-gravitating magnetized strongly coupled plasma

International Nuclear Information System (INIS)

Prajapati, R P; Sharma, P K; Sanghvi, R K; Chhajlani, R K

2012-01-01

We investigate the Jeans instability of self-gravitating magnetized strongly coupled plasma. The equations of the problem are formulated using the generalized hydrodynamic model and a general dispersion relation is obtained using the normal mode analysis. This dispersion relation is discussed for transverse and longitudinal mode of propagations. The modified condition of Jeans instability is obtained for magnetized strongly coupled plasma. We find that strong coupling of plasma particles modify the fundamental criterion of Jeans gravitational instability. In transverse mode it is found that Jeans instability criterion gets modified due to the presence of magnetic field, shear viscosity and fluid viscosity but in longitudinal mode it is unaffected due to the presence of magnetic field. From the curves we found that all these parameters have stabilizing influence on the growth rate of Jeans instability.

Bridge between fusion plasma and plasma processing

International Nuclear Information System (INIS)

Ohno, Noriyasu; Takamura, Shuichi

2008-01-01

In the present review, relationship between fusion plasma and processing plasma is discussed. From boundary-plasma studies in fusion devices new applications such as high-density plasma sources, erosion of graphite in a hydrogen plasma, formation of helium bubbles in high-melting-point metals and the use of toroidal plasmas for plasma processing are emerging. The authors would like to discuss a possibility of knowledge transfer from fusion plasmas to processing plasmas. (T. Ikehata)

Plasma edge modelling with ICRF coupling

Directory of Open Access Journals (Sweden)

Zhang Wei

2017-01-01

Full Text Available The physics of Radio-Frequency (RF wave heating in the Ion Cyclotron Range of Frequencies (ICRF in the core plasmas of fusion devices are relatively well understood while those in the Scrape-Off Layer (SOL remain still unresolved. This paper is dedicated to study the ICRF interactions with the plasma edge, mainly from the theoretical and numerical point of view, in particular with the 3D edge plasma fluid and neutral transport code EMC3-EIRENE and various wave codes. Here emphasis is given to the improvement of ICRF coupling with local gas puffing and to the ICRF induced density convection in the SOL.

''SensArray'' voltage sensor analysis in an inductively coupled plasma

International Nuclear Information System (INIS)

Titus, M. J.; Hsu, C. C.; Graves, D. B.

2010-01-01

A commercially manufactured PlasmaVolt sensor wafer was studied in an inductively coupled plasma reactor in an effort to validate sensor measurements. A pure Ar plasma at various powers (25-420 W), for a range of pressures (10-80 mT), and bias voltages (0-250 V) was utilized. A numerical sheath simulation was simultaneously developed in order to interpret experimental results. It was found that PlasmaVolt sensor measurements are proportional to the rf-current through the sheath. Under conditions such that the sheath impedance is dominantly capacitive, sensor measurements follow a scaling law derived from the inhomogeneous sheath model of Lieberman and Lichtenberg, [Principles of Plasma Discharges and Materials Processing (Wiley, New York, 2005)]. Under these conditions, sensor measurements are proportional to the square root of the plasma density at the plasma-sheath interface, the one-fourth root of the electron temperature, and the one-fourth root of the rf bias voltage. When the sheath impedance becomes increasingly resistive, the sensor measurements deviate from the scaling law and tend to be directly proportional to the plasma density. The measurements and numerical sheath simulation demonstrate the scaling behavior as a function of changing sheath impedance for various plasma conditions.

Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system

International Nuclear Information System (INIS)

Lim, Jong Hyeuk; Kim, Kyong Nam; Park, Jung Kyun; Yeom, Geun Young

2008-01-01

This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25 to 10 mm, the plasma density of a plasma source size of 2750x2350 mm 2 was increased from approximately 8x10 10 /cm 3 to 1.5x10 11 /cm 3 at 15 mTorr Ar and 9 kW of rf power

Collisionless coupling of a high- β expansion to an ambient, magnetized plasma. II. Experimental fields and measured momentum coupling

Science.gov (United States)

Bonde, Jeffrey; Vincena, Stephen; Gekelman, Walter

2018-04-01

The momentum coupled to a magnetized, ambient argon plasma from a high- β, laser-produced carbon plasma is examined in a collisionless, weakly coupled limit. The total electric field was measured by separately examining the induced component associated with the rapidly changing magnetic field of the high- β (kinetic β˜106), expanding plasma and the electrostatic component due to polarization of the expansion. Their temporal and spatial structures are discussed and their effect on the ambient argon plasma (thermal β˜10-2) is confirmed with a laser-induced fluorescence diagnostic, which directly probed the argon ion velocity distribution function. For the given experimental conditions, the electrostatic field is shown to dominate the interaction between the high- β expansion and the ambient plasma. Specifically, the expanding plasma couples energy and momentum into the ambient plasma by pulling ions inward against the flow direction.

Single-Run Single-Mask Inductively-Coupled-Plasma Reactive-Ion-Etching Process for Fabricating Suspended High-Aspect-Ratio Microstructures

Science.gov (United States)

Yang, Yao-Joe; Kuo, Wen-Cheng; Fan, Kuang-Chao

2006-01-01

In this work, we present a single-run single-mask (SRM) process for fabricating suspended high-aspect-ratio structures on standard silicon wafers using an inductively coupled plasma-reactive ion etching (ICP-RIE) etcher. This process eliminates extra fabrication steps which are required for structure release after trench etching. Released microstructures with 120 μm thickness are obtained by this process. The corresponding maximum aspect ratio of the trench is 28. The SRM process is an extended version of the standard process proposed by BOSCH GmbH (BOSCH process). The first step of the SRM process is a standard BOSCH process for trench etching, then a polymer layer is deposited on trench sidewalls as a protective layer for the subsequent structure-releasing step. The structure is released by dry isotropic etching after the polymer layer on the trench floor is removed. All the steps can be integrated into a single-run ICP process. Also, only one mask is required. Therefore, the process complexity and fabrication cost can be effectively reduced. Discussions on each SRM step and considerations for avoiding undesired etching of the silicon structures during the release process are also presented.

Bright branes for strongly coupled plasmas

International Nuclear Information System (INIS)

Mateos, David; Patino, Leonardo

2007-01-01

We use holographic techniques to study photon production in a class of finite temperature, strongly coupled, large-N c SU(N c ) quark-gluon plasmas with N f c quark flavours. Our results are valid to leading order in the electromagnetic coupling constant but non-perturbatively in the SU(N c ) interactions. The spectral function of electromagnetic currents and other related observables exhibit an interesting structure as a function of the photon frequency and the quark mass. We discuss possible implications for heavy ion collision experiments

The strongly coupled quark-gluon plasma created at RHIC

International Nuclear Information System (INIS)

Heinz, Ulrich

2009-01-01

The relativistic heavy-ion collider (RHIC) was built to re-create and study in the laboratory the extremely hot and dense matter that filled our entire universe during its first few microseconds. Its operation since June 2000 has been extremely successful, and the four large RHIC experiments have produced an impressive body of data which indeed provide compelling evidence for the formation of thermally equilibrated matter at unprecedented temperatures and energy densities-a 'quark-gluon plasma (QGP)'. A surprise has been the discovery that this plasma behaves like an almost perfect fluid, with extremely low viscosity. Theorists had expected a weakly interacting gas of quarks and gluons, but instead we seem to have created a strongly coupled plasma liquid. The experimental evidence strongly relies on a feature called 'elliptic flow' in off-central collisions, with additional support from other observations. This paper explains how we probe the strongly coupled QGP, describes the ideas and measurements which led to the conclusion that the QGP is an almost perfect liquid, and shows how they tie relativistic heavy-ion physics into other burgeoning fields of modern physics, such as strongly coupled Coulomb plasmas, ultracold systems of trapped atoms and superstring theory

Momentum Broadening in Weakly Coupled Quark-Gluon Plasma (with a view to finding the quasiparticles within liquid quark-gluon plasma)

CERN Document Server

D'Eramo, Francesco; Liu, Hong; Rajagopal, Krishna

2013-01-01

We calculate P(k_\\perp), the probability distribution for an energetic parton that propagates for a distance L through a medium without radiating to pick up transverse momentum k_\\perp, for a medium consisting of weakly coupled quark-gluon plasma. We use full or HTL self-energies in appropriate regimes, resumming each in order to find the leading large-L behavior. The jet quenching parameter \\hat q is the second moment of P(k_\\perp), and we compare our results to other determinations of this quantity in the literature, although we emphasize the importance of looking at P(k_\\perp) in its entirety. We compare our results for P(k_\\perp) in weakly coupled quark-gluon plasma to expectations from holographic calculations that assume a plasma that is strongly coupled at all length scales. We find that the shape of P(k_\\perp) at modest k_\\perp may not be very different in weakly coupled and strongly coupled plasmas, but we find that P(k_\\perp) must be parametrically larger in a weakly coupled plasma than in a strongl...

DC plasma ion implantation in an inductively coupled RF plasma

International Nuclear Information System (INIS)

Silawatshananai, C.; Matan, N.; Pakpum, C.; Pussadee, N.; Srisantitam, P.; Davynov, S.; Vilaithong, T.

2004-01-01

Various modes of plasma ion implantation have been investigated in a small inductively coupled 13.6 MHz RF plasma source. Plasma ion implantation with HVDC(up to -10 kV bias) has been investigated in order to incorporate with the conventional implantation of diamond like carbon. In this preliminary work, nitrogen ions are implanted into the stainless steel sample with a dose of 5.5 x 10 -2 cm for a short implanting time of 7 minutes without target cooling. Surface properties such as microhardness, wear rate and the friction coefficient have been improved. X-ray and SEM analyses show distinct structural changes on the surface. A combination of sheath assisted implantation and thermal diffusion may be responsible for improvement in surface properties. (orig.)

Ideal gas behavior of a strongly coupled complex (dusty) plasma.

Science.gov (United States)

Oxtoby, Neil P; Griffith, Elias J; Durniak, Céline; Ralph, Jason F; Samsonov, Dmitry

2013-07-05

In a laboratory, a two-dimensional complex (dusty) plasma consists of a low-density ionized gas containing a confined suspension of Yukawa-coupled plastic microspheres. For an initial crystal-like form, we report ideal gas behavior in this strongly coupled system during shock-wave experiments. This evidence supports the use of the ideal gas law as the equation of state for soft crystals such as those formed by dusty plasmas.

Ideal gas behavior of a strongly-coupled complex (dusty) plasma

OpenAIRE

Oxtoby, Neil P.; Griffith, Elias J.; Durniak, Céline; Ralph, Jason F.; Samsonov, Dmitry

2012-01-01

In a laboratory, a two-dimensional complex (dusty) plasma consists of a low-density ionized gas containing a confined suspension of Yukawa-coupled plastic microspheres. For an initial crystal-like form, we report ideal gas behavior in this strongly-coupled system during shock-wave experiments. This evidence supports the use of the ideal gas law as the equation of state for soft crystals such as those formed by dusty plasmas.

3-Dimensional Modeling of Capacitively and Inductively Coupled Plasma Etching Systems

Science.gov (United States)

Rauf, Shahid

2008-10-01

Low temperature plasmas are widely used for thin film etching during micro and nano-electronic device fabrication. Fluid and hybrid plasma models were developed 15-20 years ago to understand the fundamentals of these plasmas and plasma etching. These models have significantly evolved since then, and are now a major tool used for new plasma hardware design and problem resolution. Plasma etching is a complex physical phenomenon, where inter-coupled plasma, electromagnetic, fluid dynamics, and thermal effects all have a major influence. The next frontier in the evolution of fluid-based plasma models is where these models are able to self-consistently treat the inter-coupling of plasma physics with fluid dynamics, electromagnetics, heat transfer and magnetostatics. We describe one such model in this paper and illustrate its use in solving engineering problems of interest for next generation plasma etcher design. Our 3-dimensional plasma model includes the full set of Maxwell equations, transport equations for all charged and neutral species in the plasma, the Navier-Stokes equation for fluid flow, and Kirchhoff's equations for the lumped external circuit. This model also includes Monte Carlo based kinetic models for secondary electrons and stochastic heating, and can take account of plasma chemistry. This modeling formalism allows us to self-consistently treat the dynamics in commercial inductively and capacitively coupled plasma etching reactors with realistic plasma chemistries, magnetic fields, and reactor geometries. We are also able to investigate the influence of the distributed electromagnetic circuit at very high frequencies (VHF) on the plasma dynamics. The model is used to assess the impact of azimuthal asymmetries in plasma reactor design (e.g., off-center pump, 3D magnetic field, slit valve, flow restrictor) on plasma characteristics at frequencies from 2 -- 180 MHz. With Jason Kenney, Ankur Agarwal, Ajit Balakrishna, Kallol Bera, and Ken Collins.

Development of a low-cost inductively coupled argon plasma

International Nuclear Information System (INIS)

Ripson, P.A.M.

1983-01-01

The aim of this investigation is to drastically reduce running costs of an inductively coupled plasma. This is done by reducing the argon consumption from 20 l/min to about 1 l/min. First, a sample introduction system operating on 0.1 l/min of carrier argon is described. This system ensures a high ratio of plasma argon and carrier argon even at the low total argon consumptions intended. Next, the developed low consumption plasma is presented. In the proposed design, air is blown perpendicularly against the outside of the torch. A different coil has been developed to make air-cooling efficient. Preliminary data on coupling efficiency for the air-cooled plasma are presented. A similarly low argon consumption has been achieved with water as an external coolant medium. It is concluded that a cheaper alternative to the current ICP has become available. (Auth.)

Enhanced laser beam coupling to a plasma

International Nuclear Information System (INIS)

Steiger, A.D.; Woods, C.H.

1976-01-01

Density perturbations are induced in a heated plasma by means of a pair of oppositely directed, polarized laser beams of the same frequency. The wavelength of the density perturbations is equal to one half the wavelength of the laser beams. A third laser beam is linearly polarized and directed at the perturbed plasma along a line that is perpendicular to the direction of the two opposed beams. The electric field of the third beam is oriented to lie in the plane containing the three beams. The frequency of the third beam is chosen to cause it to interact resonantly with the plasma density perturbations, thereby efficiently coupling the energy of the third beam to the plasma. 10 claims, 2 figures

SU-8 etching in inductively coupled oxygen plasma

DEFF Research Database (Denmark)

Rasmussen, Kristian Hagsted; Keller, Stephan Sylvest; Jensen, Flemming

2013-01-01

Structuring or removal of the epoxy based, photo sensitive polymer SU-8 by inductively coupled plasma reactive ion etching (ICP-RIE) was investigated as a function of plasma chemistry, bias power, temperature, and pressure. In a pure oxygen plasma, surface accumulation of antimony from the photo......-initiator introduced severe roughness and reduced etch rate significantly. Addition of SF6 to the plasma chemistry reduced the antimony surface concentration with lower roughness and higher etch rate as an outcome. Furthermore the etch anisotropy could be tuned by controlling the bias power. Etch rates up to 800 nm...

Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process

International Nuclear Information System (INIS)

Wu Hongchen; Zhang Huafang; Peng Liping; Jiang Yanli; Ma Guojia

2004-01-01

The Plasma Immersion Ion Implantation and Deposition (PIII and D) process has many advantages over the pure plasma immersion ion implantation or deposition. It can compensate for or eliminate the disadvantages of the shallow modification layer (for PIII) and increase the bond strength of the coating (of deposition). For this purpose, a new type of microwave plasma source used in the PIII and D process was developed, composed of a vacuum bend wave guide and a special magnetic circuit, so that the coupling window was protected from being deposited with a coating and bombarded by high-energy particles. So the life of the window is increased. To enhance the bonding between the coating and substrate a new biasing voltage is applied to the work piece so that the implantation and deposition (or hybrid process) can be completed in one vacuum cycle

Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

Science.gov (United States)

Lee, Hyo-Chang

2018-03-01

Many different gas discharges and plasmas exhibit bistable states under a given set of conditions, and the history-dependent hysteresis that is manifested by intensive quantities of the system upon variation of an external parameter has been observed in inductively coupled plasmas (ICPs). When the external parameters (such as discharge powers) increase, the plasma density increases suddenly from a low- to high-density mode, whereas decreasing the power maintains the plasma in a relatively high-density mode, resulting in significant hysteresis. To date, a comprehensive description of plasma hysteresis and a physical understanding of the main mechanism underlying their bistability remain elusive, despite many experimental observations of plasma bistability conducted under radio-frequency ICP excitation. This fundamental understanding of mode transitions and hysteresis is essential and highly important in various applied fields owing to the widespread use of ICPs, such as semiconductor/display/solar-cell processing (etching, deposition, and ashing), wireless light lamp, nanostructure fabrication, nuclear-fusion operation, spacecraft propulsion, gas reformation, and the removal of hazardous gases and materials. If, in such applications, plasma undergoes a mode transition and hysteresis occurs in response to external perturbations, the process result will be strongly affected. Due to these reasons, this paper comprehensively reviews both the current knowledge in the context of the various applied fields and the global understanding of the bistability and hysteresis physics in the ICPs. At first, the basic understanding of the ICP is given. After that, applications of ICPs to various applied fields of nano/environmental/energy-science are introduced. Finally, the mode transition and hysteresis in ICPs are studied in detail. This study will show the fundamental understanding of hysteresis physics in plasmas and give open possibilities for applications to various applied

Effects of Reentry Plasma Sheath on Mutual-Coupling Property of Array Antenna

Directory of Open Access Journals (Sweden)

B. W. Bai

2015-01-01

Full Text Available A plasma sheath enveloping a reentry vehicle would cause the failure of on-board antennas, which is an important effect that contributes to the “blackout” problem. The method of replacing the on-board single antenna with the array antennas and using beamforming technology has been proposed to mitigate “blackout” problem by many other researchers. Because the plasma sheath is a reflective medium, plasma will alter the mutual coupling between array elements and degrade the beamforming performance of array antenna. In this paper, the effects of the plasma sheath on the mutual coupling properties between adjacent array elements are studied utilizing the algorithm of finite integration technique. Results show that mutual coupling coefficients of array elements are deteriorating more seriously with the decrease of collision frequency. Moreover, when electron density and collision frequency are both large, plasma sheath improves the mutual coupling property of array elements; this conclusion suggests that replacing the on-board single antenna with the array antennas and using beamforming technology can be adopted to mitigate the blackout problem in this condition.

Dynamics and structure of ignition process in plasma. Ignition dynamics and structure of laboratory plasmas

International Nuclear Information System (INIS)

Nagasaki, Kazunobu; Takamura, Shuichi; Razzak, Md. Abdur; Uesugi, Yoshihiko; Yoshimura, Yasuo; Cappa, Alvaro

2008-01-01

The dynamics and structure of plasma production are stated by the results of two experiments such as the radio frequency thermal plasmas produced by inductively coupled plasma technique at atmospheric pressure and the second harmonic ECH. The first experiment results explained transition from the electrostatic discharge mode of forming streamer to the induced discharge mode after forming the discharge channel that the streamer connected to in the azimuth direction. The other experiment explained the dynamics which the initial plasma produced at the ECH resonance point spread in the direction of radius. The divergence and transition related to the nonlinear process were observed independently existing the magnetic field or incident power. The experiment devices, conditions, results, and modeling are reported. (S.Y.)

Nonlinear wave coupling in a warm plasma in the fluid

International Nuclear Information System (INIS)

Malara, F.; Veltri, P.

1984-01-01

The general expression for nonlinear coupling between plasma modes is obtained. The nonlinear conductivity tensor is then calculated by means of the two-fluid plasma description taking into account the thermal pressure effects

Inductively coupled plasma and ion sources: History and state-of-the-art

International Nuclear Information System (INIS)

Hopwood, J.

1994-01-01

Over 100 years ago Hittorf first generated an electrodeless ''ring'' discharge by electromagnetic induction and began a 40 year controversy as to the true physical origin of such a discharge. Even Tesla advocated that these plasmas were merely the result of large electrostatic potential differences rather than electric fields induced by high frequency currents. Through clever experiments using crude spark gaps and leyden jars, the inductive nature of the discharge was confirmed in the late 1920's by MacKinnon, thus supporting the theories and experiments of Sir J.J. Thomson, perhaps the most staunch advocate of the induction mechanism. Today the authors routinely exploit the intense plasmas which are generated by induction. In this talk, the characteristics of inductively coupled plasma (ICP) and ion sources will be reviewed and future applications of intense plasma sources will be discussed. The inductively coupled plasma is Joule heated at moderate gas pressures, but the electromagnetic field penetration of these dense plasmas is limited by the plasma skin depth, typically a few millimeters to a few centimeters. The induction plasma is thus edge heated, a fact that constrains uniformity over large areas if helical induction coils are used. Flat, spiral coils may be used to improve uniformity by driving the plasma using a planar geometry. Issues of dimensional and frequency scaling will be discussed as they apply to large diameter sources. Ion beams extracted from ICPs are used for many applications including space propulsion, high power neutral beams, and materials processing. Broad ion beam (∼10 cm) current densities in excess of 100 mA-cm 2 at 100 keV are obtained in pulsed mode operation. Recently, however, more consumer-oriented applications of less intense ICPs are emerging

Aluminium content of some processed foods, raw materials and food additives in China by inductively coupled plasma-mass spectrometry.

Science.gov (United States)

Deng, Gui-Fang; Li, Ke; Ma, Jing; Liu, Fen; Dai, Jing-Jing; Li, Hua-Bin

2011-01-01

The level of aluminium in 178 processed food samples from Shenzhen city in China was evaluated using inductively coupled plasma-mass spectrometry. Some processed foods contained a concentration of up to 1226 mg/kg, which is about 12 times the Chinese food standard. To establish the main source in these foods, Al levels in the raw materials were determined. However, aluminium concentrations in raw materials were low (0.10-451.5 mg/kg). Therefore, aluminium levels in food additives used in these foods was determined and it was found that some food additives contained a high concentration of aluminium (0.005-57.4 g/kg). The results suggested that, in the interest of public health, food additives containing high concentrations of aluminium should be replaced by those containing less. This study has provided new information on aluminium levels in Chinese processed foods, raw materials and a selection of food additives.

A new class of strongly coupled plasmas inspired by sonoluminescence

Science.gov (United States)

Bataller, Alexander; Plateau, Guillaume; Kappus, Brian; Putterman, Seth

2014-10-01

Sonoluminescence originates in a strongly coupled plasma with a near liquid density and a temperature of ~10,000 K. This plasma is in LTE and therefore, it should be a general thermodynamic state. To test the universality of sonoluminescence, similar plasma conditions were generated using femtosecond laser breakdown in high pressure gases. Calibrated streak spectroscopy reveals both transport and thermodynamic properties of a strongly coupled plasma. A blackbody spectrum, which persists long after the exciting laser has turned off, indicates the presence of a highly ionized LTE microplasma. In parallel with sonoluminescence, this thermodynamic state is achieved via a considerable reduction in the ionization potential. We gratefully acknowledge support from DARPA MTO for research on microplasmas. We thank Brian Naranjo, Keith Weninger, Carlos Camara, Gary Williams, and John Koulakis for valuable discussions.

The effect of hydrogen on B4C coatings fabrication in inductively coupled plasma torch

Directory of Open Access Journals (Sweden)

Q. J. Guo

2018-02-01

Full Text Available Boron carbide (B4C coatings are prepared by an RF inductively coupled plasma (ICP torch with different amounts of hydrogen introduced into the sheath gas. The effects of the added hydrogen on the characteristics of the plasma are diagnosed by optical emission spectroscopy and high speed photography. The effects on the melting of B4C particles in the plasma are studied by scanning electron microscopy (SEM. The microstructure of the B4C coatings was determined with SEM imaging and x-ray diffraction analysis. The results show that adding hydrogen to the sheath gas leads to plasma contraction, which results in higher gas temperature of plasma. It also enhances B4C particles spheroidizing and improves the compactness of B4C coatings. Plasma processing does not change the main phase of boron carbide. The obtained results on B4C coatings on Cu substrates allows for improving the B4C coatings fabrication process.

High efficiency nebulization for helium inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Jorabchi, Kaveh; McCormick, Ryan; Levine, Jonathan A.; Liu Huiying; Nam, S.-H.; Montaser, Akbar

2006-01-01

A pneumatically-driven, high efficiency nebulizer is explored for helium inductively coupled plasma mass spectrometry. The aerosol characteristics and analyte transport efficiencies of the high efficiency nebulizer for nebulization with helium are measured and compared to the results obtained with argon. Analytical performance indices of the helium inductively coupled plasma mass spectrometry are evaluated in terms of detection limits and precision. The helium inductively coupled plasma mass spectrometry detection limits obtained with the high efficiency nebulizer at 200 μL/min are higher than those achieved with the ultrasonic nebulizer consuming 2 mL/min solution, however, precision is generally better with high efficiency nebulizer (1-4% vs. 3-8% with ultrasonic nebulizer). Detection limits with the high efficiency nebulizer at 200 μL/min solution uptake rate approach those using ultrasonic nebulizer upon efficient desolvation with a heated spray chamber followed by a Peltier-cooled multipass condenser

Impact of plasma tube wall thickness on power coupling in ICP sources

International Nuclear Information System (INIS)

Nawaz, Anuscheh; Herdrich, Georg

2009-01-01

The inductively heated plasma source at the Institute of Space Systems was investigated with respect to the wall thickness of the plasma tube using an air plasma. For this, the wall thickness of the quartz tube was reduced in steps from 2.5 to 1.25 mm. The significance of reducing the wall thickness was analyzed with respect to both the maximum allowable tube cooling power and the coupling efficiency. While the former results from thermal stresses in the tube's wall, the latter results from a minimization of magnetic field losses near the coil turns of the inductively coupled plasma (ICP) source. Analysis of the thermal stress could be validated by experimental data, i.e. the measurement of the tube cooling power when the respective tube structure failed. The coupling efficiency could be assessed qualitatively by simplified models, and the experimental data recorded show that coupling was improved far more than predicted.

Self-organization observed in either fusion or strongly coupled plasmas

International Nuclear Information System (INIS)

Himura, Haruhiko; Sanpei, Akio

2011-01-01

If self-organization happens in the fusion plasma, the plasma alters its shape by weakening the confining magnetic field. The self-organized plasma is stable and robust, so its configuration is conserved even during transport in asymmetric magnetic fields. The self-organization of the plasma is driven by an electrostatic potential. Examples of the plasma that has such strong potential are non-neutral plasmas of pure ions or electrons and dusty plasmas. In the present paper, characteristic phenomena of strongly coupled plasmas such as particle aggregation and formation of the ordered structure are discussed. (T.I.)

Capacity-coupled multidischarge for atmospheric plasma production

International Nuclear Information System (INIS)

Mase, Hiroshi; Fujiwara, Tamiya; Sato, Noriyoshi

2003-01-01

We propose a method of plasma production by capacity-coupled multidischarge (CCMD) at atmospheric pressure. The discharge gaps in the CCMD consist of a common electrode and a number of compact electrodes (CCE) which are directly coupled with small capacitors for quenching the discharge. A simple CCE structure is provided by a cylindrical capacitor, the inner conductor of which is used as a gap electrode. A short pulse discharge is observed to appear homogeneously at each CCE. A charge transfer for the single-pulsed discharge is 10-100 times as large as that of the conventional dielectric barrier discharge. A high efficiency of ozone production has been confirmed in the CCMD using O 2 gas. A device configuration of the CCMD is quite flexible with respect to its geometrical shape and size. The CCMD could be used to produce plasmas for various kinds of industrial applications at atmospheric pressure

Multistage Coupling of Laser-Wakefield Accelerators with Curved Plasma Channels

Science.gov (United States)

Luo, J.; Chen, M.; Wu, W. Y.; Weng, S. M.; Sheng, Z. M.; Schroeder, C. B.; Jaroszynski, D. A.; Esarey, E.; Leemans, W. P.; Mori, W. B.; Zhang, J.

2018-04-01

Multistage coupling of laser-wakefield accelerators is essential to overcome laser energy depletion for high-energy applications such as TeV-level electron-positron colliders. Current staging schemes feed subsequent laser pulses into stages using plasma mirrors while controlling electron beam focusing with plasma lenses. Here a more compact and efficient scheme is proposed to realize the simultaneous coupling of the electron beam and the laser pulse into a second stage. A partly curved channel, integrating a straight acceleration stage with a curved transition segment, is used to guide a fresh laser pulse into a subsequent straight channel, while the electrons continue straight. This scheme benefits from a shorter coupling distance and continuous guiding of the electrons in plasma while suppressing transverse beam dispersion. Particle-in-cell simulations demonstrate that the electron beam from a previous stage can be efficiently injected into a subsequent stage for further acceleration while maintaining high capture efficiency, stability, and beam quality.

Numerical study of laser-induced blast wave coupled with unsteady ionization processes

International Nuclear Information System (INIS)

Ogino, Y; Ohnishi, N; Sawada, K

2008-01-01

We present the results of the numerical simulation of laser-induced blast wave coupled with rate equations to clarify the unsteady property of ionization processes during pulse heating. From comparison with quasi-steady computations, the plasma region expands more widely, which is sustained by the inverse-bremsstrahlung since an ionization equilibrium does not establish at the front of the plasma region. The delayed relaxation leads to the rapid expansion of the driving plasma and enhances the energy conversion efficiency from a pulse heating laser to the blast wave

Inductively coupled plasma- mass spectrometry. Chapter 13

International Nuclear Information System (INIS)

Mahalingam, T.R.

1997-01-01

Inductively Coupled Plasma - Mass Spectrometry (ICP-MS) is a new technique for elemental and isotopic analysis which is currently attracting a great deal of interest. This relatively new technique has found wide applications in different fields of research viz., nuclear, geological, biological and environmental sciences

Modeling of subtle kinetic processes in plasma simulation

International Nuclear Information System (INIS)

Sydora, R.D.; Decyk, V.K.; Dawson, J.M.

1988-01-01

A new diagnostic method for plasma simulation models is presented which enables one to probe the subtle dielectric properties of the plasma medium. The procedure involves the removal of the background plasma response in order to isolate the effects of small perturbing influences which are externally added. We have found the technique accurately describes fundamental kinetic plasma behavior such as the shielding of individual test charges and currents. Wave emission studies and drag of test particles has been carried out in explicit particle algorithms as well as large time step implicit and gyrokinetic models. Accurate plasma behavior is produced and it is possible to investigate in detail, processes which can be compared with plasma kinetic theory. The technique of subtraction is not only limited to particle simulation models but also can be used in MHD or fluid models where resolution is difficult due to the intensity of the background response relative to the phenomena one is interested in measuring, such as a weakly grouwing instability or nonlinear mode coupling effect. (author)

Research progress of laser welding process dynamic monitoring technology based on plasma characteristics signal

Directory of Open Access Journals (Sweden)

Teng WANG

2017-02-01

Full Text Available During the high-power laser welding process, plasmas are induced by the evaporation of metal under laser radiation, which can affect the coupling of laser energy and the workpiece, and ultimately impact on the reliability of laser welding quality and process directly. The research of laser-induced plasma is a focus in high-power deep penetration welding field, which provides a promising research area for realizing the automation of welding process quality inspection. In recent years, the research of laser welding process dynamic monitoring technology based on plasma characteristics is mainly in two aspects, namely the research of plasma signal detection and the research of laser welding process modeling. The laser-induced plasma in the laser welding is introduced, and the related research of laser welding process dynamic monitoring technology based on plasma characteristics at home and abroad is analyzed. The current problems in the field are summarized, and the future development trend is put forward.

LH-power coupling in advanced tokamak plasmas in JET

International Nuclear Information System (INIS)

Joffrin, E.; Erents, K.; Gormezano, C.

2000-02-01

Lower Hybrid Current Drive (LHCD) is the most efficient tool to generate non-inductive current in tokamak plasmas. In JET, significant modifications of the current profile have been recently achieved in coupling up to 3MW of LH power in optimised shear discharges. However, the improved particle confinement during optimised shear plasmas results in a sharp decrease of the electron density in front the launcher close or below the cut-off density (ne=1.7.10 17 m -3 for f LH =37GHz) and makes difficult the coupling of the LH power. Deuterium gas near the launcher can help to improve the coupling, but has also the effect of increasing the ELM activity leading to the erosion of the internal transport barrier (ITB). Future development of lower hybrid launcher should include the constraints imposed by scenario such as the optimised shear. (author)

Study on the RF inductively coupled plasma spheroidization of refractory W and W-Ta alloy powders

Science.gov (United States)

Chenfan, YU; Xin, ZHOU; Dianzheng, WANG; Neuyen VAN, LINH; Wei, LIU

2018-01-01

Spherical powders with good flowability and high stacking density are mandatory for powder bed additive manufacturing. Nevertheless, the preparation of spherical refractory tungsten and tungsten alloy powders is a formidable task. In this paper, spherical refractory metal powders processed by high-energy stir ball milling and RF inductively coupled plasma were investigated. By utilizing the technical route, pure spherical tungsten powders were prepared successfully, the flowability increased from 10.7 s/50 g to 5.5 s/50 g and apparent density increased from 6.916 g cm-3 to 11.041 g cm-3. Alloying element tantalum can reduce the tendency to micro-crack during tungsten laser melting and rapid solidification process. Spherical W-6Ta (%wt) powders were prepared in this way, homogeneous dispersion of tantalum in a tungsten matrix occurred but a small amount of flake-like shape particles appeared after high-energy stir ball milling. The flake-like shape particles can hardly be spheroidized in subsequent RF inductively coupled plasma process, might result from the unique suspended state of flaky particles under complex electric and magnetic fields as well as plasma-particle heat exchange was different under various turbulence models. As a result, the flake-like shape particles cannot pass through the high-temperature area of thermal plasma torch and cannot be spheroidized properly.

Real-time control of electron density in a capacitively coupled plasma

International Nuclear Information System (INIS)

Keville, Bernard; Gaman, Cezar; Turner, Miles M.; Zhang Yang; Daniels, Stephen; Holohan, Anthony M.

2013-01-01

Reactive ion etching (RIE) is sensitive to changes in chamber conditions, such as wall seasoning, which have a deleterious effect on process reproducibility. The application of real time, closed loop control to RIE may reduce this sensitivity and facilitate production with tighter tolerances. The real-time, closed loop control of plasma density with RF power in a capacitively coupled argon plasma using a hairpin resonance probe as a sensor is described. Elementary control analysis shows that an integral controller provides stable and effective set point tracking and disturbance attenuation. The trade off between performance and robustness may be quantified in terms of one parameter, namely the position of the closed loop pole. Experimental results are presented, which are consistent with the theoretical analysis.

Plasma diagnostics using laser-excited coupled and transmission ring resonators

International Nuclear Information System (INIS)

Haas, R.A.

1976-01-01

In this paper a simple two-level laser model is used to investigate the frequency response of coupled-cavity laser interferometers. It is found that under certain circumstances, often satisfied by molecular gas lasers, the frequency response exhibits a resonant behavior. This behavior severely complicates the interpretation of coupled-cavity laser interferometer measurements of rapidly varying plasmas. To circumvent this limitation a new type of laser interferometer plasma diagnostic with significantly improved time response was developed. In this interferometer the plasma is located in one arm of a transmission ring resonator cavity that is excited by an externally positioned laser. Thus, the laser is decoupled from the interferometer cavity and the time response of the interferometer is then limited by the Q of the ring resonator cavity. This improved time response is acquired without loss of spatial resolution, but requires a more sensitive signal detector since the laser is no longer used as a detector as it is in conventional coupled-cavity laser interferometers. Thus, the new technique incorporates the speed of the Mach--Zender interferometer and the sensitivity of the coupled-cavity laser interferometer. The basic operating principles of this type of interferometer have been verified using a CO 2 laser

Equation of state of strongly coupled plasma mixtures

International Nuclear Information System (INIS)

DeWitt, H.E.

1984-01-01

Thermodynamic properties of strongly coupled (high density) plasmas of mixtures of light elements have been obtained by Monte Carlo simulations. For an assumed uniform charge background the equation of state of ionic mixtures is a simple extension of the one-component plasma EOS. More realistic electron screening effects are treated in linear response theory and with an appropriate electron dielectric function. Results have been obtained for the ionic pair distribution functions, and for the electric microfield distribution

Non-Equilibrium Modeling of Inductively Coupled RF Plasmas

Science.gov (United States)

2015-01-01

wall can be approximated with the expression for an infinite solenoid , B(r = R) = µ0NIc, where quan- tities N and Ic are the number of turns per unit...Modeling of non-equilibrium plasmas in an induc- tively coupled plasma facility. AIAA Paper 2014– 2235, 2014. 45th AIAA Plasmadynamics and Lasers ...1993. 24th Plas- madynamics and Laser Conference, Orlando, FL. [22] M. Capitelli, I. Armenise, D. Bruno, M. Caccia- tore, R. Celiberto, G. Colonna, O

Electron screening and kinetic-energy oscillations in a strongly coupled plasma

International Nuclear Information System (INIS)

Chen, Y.C.; Simien, C.E.; Laha, S.; Gupta, P.; Martinez, Y.N.; Mickelson, P.G.; Nagel, S.B.; Killian, T.C.

2004-01-01

We study equilibration of strongly coupled ions in an ultracold neutral plasma produced by photoionizing laser-cooled and trapped atoms. By varying the electron temperature, we show that electron screening modifies the equilibrium ion temperature. Even with few electrons in a Debye sphere, the screening is well described by a model using a Yukawa ion-ion potential. We also observe damped oscillations of the ion kinetic energy that are a unique feature of equilibration of a strongly coupled plasma

The strongly coupled quark-gluon plasma created at RHIC

CERN Document Server

Heinz, Ulrich W

2009-01-01

The Relativistic Heavy Ion Collider (RHIC) was built to re-create and study in the laboratory the extremely hot and dense matter that filled our entire universe during its first few microseconds. Its operation since June 2000 has been extremely successful, and the four large RHIC experiments have produced an impressive body of data which indeed provide compelling evidence for the formation of thermally equilibrated matter at unprecedented temperatures and energy densities -- a "quark-gluon plasma (QGP)". A surprise has been the discovery that this plasma behaves like an almost perfect fluid, with extremely low viscosity. Theorists had expected a weakly interacting gas of quarks and gluons, but instead we seem to have created a strongly coupled plasma liquid. The experimental evidence strongly relies on a feature called "elliptic flow" in off-central collisions, with additional support from other observations. This article explains how we probe the strongly coupled QGP, describes the ideas and measurements whi...

Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition

International Nuclear Information System (INIS)

Tinck, S; Bogaerts, A

2011-01-01

In this paper, an O 2 inductively coupled plasma used for plasma enhanced atomic layer deposition of Al 2 O 3 thin films is investigated by means of modeling. This work intends to provide more information about basic plasma properties such as species densities and species fluxes to the substrate as a function of power and pressure, which might be hard to measure experimentally. For this purpose, a hybrid model developed by Kushner et al is applied to calculate the plasma characteristics in the reactor volume for different chamber pressures ranging from 1 to 10 mTorr and different coil powers ranging from 50 to 500 W. Density profiles of the various oxygen containing plasma species are reported as well as fluxes to the substrate under various operating conditions. Furthermore, different orientations of the substrate, which can be placed vertically or horizontally in the reactor, are taken into account. In addition, special attention is paid to the recombination process of atomic oxygen on the different reactor walls under the stated operating conditions. From this work it can be concluded that the plasma properties change significantly in different locations of the reactor. The plasma density near the cylindrical coil is high, while it is almost negligible in the neighborhood of the substrate. Ion and excited species fluxes to the substrate are found to be very low and negligible. Finally, the orientation of the substrate has a minor effect on the flux of O 2 , while it has a significant effect on the flux of O. In the horizontal configuration, the flux of atomic oxygen can be up to one order of magnitude lower than in the vertical configuration.

Determination of rare earth elements in aluminum by inductively coupled plasma-atomic emission spectroscopy

International Nuclear Information System (INIS)

Mahanti, H.S.; Barnes, R.M.

1983-01-01

Inductively coupled plasma-atomic emission spectroscopy is evaluated for the determination of 14 rare earth elements in aluminum. Spectral line interference, limit of detection, and background equivalent concentration values are evaluated, and quantitative recovery is obtained from aluminum samples spiked with rare earth elements. The procedure is simple and suitable for routine process control analysis. 20 references, 5 tables

Plasma processing for VLSI

CERN Document Server

Einspruch, Norman G

1984-01-01

VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching.This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section

Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms

International Nuclear Information System (INIS)

Lafleur, T; Delattre, P A; Booth, J P; Johnson, E V

2013-01-01

By applying certain types of ‘tailored’ voltage waveforms (TVWs) to capacitively coupled plasmas, a dc self-bias and an asymmetric plasma response can be produced, even in geometrically symmetric reactors. Furthermore, these arbitrary applied waveforms can produce a number of interesting phenomena that are not present in typical single-frequency sinusoidal discharges. This electrical asymmetry effect presents emerging possibilities for the improved control of the ion energy and ion flux in these systems; parameters of vital importance to both etching and deposition applications for materials processing. With a combined research approach utilizing both experimental measurements, and particle-in-cell simulations, we review and extend recent investigations that study a particular class of TVW. The waveforms used have a pulse-type shape and are composed of a varying number of harmonic frequencies. This allows a strong self-bias to be produced, and causes most of the applied voltage to be dropped across a single sheath. Additionally, decreasing the pulse width (by increasing the number of harmonics), allows the plasma density and ion flux to be increased. Simulation and experimental results both demonstrate that this type of waveform can be used to separately control the ion flux and ion energy, while still producing a uniform plasma over large area (50 cm diameter) rf electrodes. (paper)

Approximation scheme for strongly coupled plasmas: Dynamical theory

International Nuclear Information System (INIS)

Golden, K.I.; Kalman, G.

1979-01-01

The authors present a self-consistent approximation scheme for the calculation of the dynamical polarizability α (k, ω) at long wavelengths in strongly coupled one-component plasmas. Development of the scheme is carried out in two stages. The first stage follows the earlier Golden-Kalman-Silevitch (GKS) velocity-average approximation approach, but goes much further in its application of the nonlinear fluctuation-dissipation theorem to dynamical calculations. The result is the simple expression for α (k, ω), αatsub GKSat(k, ω) 4 moment sum rule. In the second stage, the above dynamical expression is made self-consistent at long wavelengths by postulating that a decomposition of the quadratic polarizabilities in terms of linear ones, which prevails in the k → 0 limit for weak coupling, can be relied upon as a paradigm for arbitrary coupling. The result is a relatively simple quadratic integral equation for α. Its evaluation in the weak-coupling limit and its comparison with known exact results in that limit reveal that almost all important correlational and long-time effects are reproduced by our theory with very good numerical accuracy over the entire frequency range; the only significant defect of the approximation seems to be the absence of the ''dominant'' γ ln γ -1 (γ is the plasma parameter) contribution to Im α

Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer

International Nuclear Information System (INIS)

Setsuhara, Yuichi; Cho, Ken; Takenaka, Kosuke; Shiratani, Masaharu; Sekine, Makoto; Hori, Masaru

2010-01-01

A plasma-process analyzer has been developed on the basis of combinatorial method, in which process examinations with continuous variations of plasma-process conditions can be carried out on a substrate holder with an inclined distribution of process parameters. Combinatorial plasma-process analyses have been demonstrated for examinations of plasma-polymer interactions in terms of etching characteristics and surface morphologies in order to show feasibility and effectiveness of the methodology as advanced research and development for next-generation plasma nano processes. The etching properties and surface morphologies have been investigated for polyethylene terephthalate (PET) films exposed to argon-oxygen mixture plasmas. The etching depth data obtained from three independent batches of the experiments showed universal and almost linear dependence with increasing product of (ion saturation current) x (exposure time); i.e. ion dose. Surface roughness of the polymer slightly increased with increasing ion dose, while the mean spacing after plasma exposure was found to decrease monotonically with increasing ion dose but was saturated at the level of approximately 250 nm.

Atomic fluorescence spectrometry with the inductively coupled plasma

International Nuclear Information System (INIS)

Omenetto, N.; Winefordner, J.D.

1987-01-01

Atomic fluorescence spectrometry (AFS) is based on the radiational activation of atoms and ions produced in a suitable atomizer (ionizer) and the subsequent measurement of the resulting radiational deactivation, called fluorescence. Atomic fluorescence spectrometry has been of considerable interest to researchers in atomic spectrometry because of its use for both analytical and diagnostic purposes. Unfortunately, the analytical applications of AFS have suffered from the lack of commercial instrumentation until the recent marketing of the Baird multiple-element, hollow cathode lamp-excited inductively coupled plasma system. This chapter is concerned strictly with the use of the inductively coupled plasma (ICP) as a cell and as a source for AFS. Many of the major references concerning the ICP in analytical AFS are categorized in Table 9.1, along with several reviews and diagnostical studies. For more detailed discussions of the fundamental aspects of AFS, the reader is referred to previous reviews

Controlled elaboration of large-area plasmonic substrates by plasma process

International Nuclear Information System (INIS)

Pugliara, A; Despax, B; Makasheva, K; Bonafos, C; Carles, R

2015-01-01

Elaboration in a controlled way of large-area and efficient plasmonic substrates is achieved by combining sputtering of silver nanoparticles (AgNPs) and plasma polymerization of the embedding dielectric matrix in an axially asymmetric, capacitively coupled RF discharge maintained at low gas pressure. The plasma parameters and deposition conditions were optimized according to the optical response of these substrates. Structural and optical characterizations of the samples confirm the process efficiency. The obtained results indicate that to deposit a single layer of large and closely situated AgNPs, a high injected power and short sputtering times must be privileged. The plasma-elaborated plasmonic substrates appear to be very sensitive to any stimuli that affect their plasmonic response. (paper)

A comprehensive study of different gases in inductively coupled plasma torch operating at one atmosphere

International Nuclear Information System (INIS)

Punjabi, Sangeeta B.; Joshi, N. K.; Mangalvedekar, H. A.; Lande, B. K.; Das, A. K.; Kothari, D. C.

2012-01-01

A numerical study is done to understand the possible operating regimes of RF-ICP torch (3 MHz, 50 kW) using different gases for plasma formation at atmospheric pressure. A two dimensional numerical simulation of RF-ICP torch using argon, nitrogen, oxygen, and air as plasma gas has been investigated using computational fluid dynamic (CFD) software fluent (c) . The operating parameters varied here are central gas flow, sheath gas flow, RF-power dissipated in plasma, and plasma gas. The temperature contours, flow field, axial, and radial velocity profiles were investigated under different operating conditions. The plasma resistance, inductance of the torch, and the heat distribution for various plasma gases have also been investigated. The plasma impedance of ICP torch varies with different operating parameters and plays an important role for RF oscillator design and power coupling. These studies will be useful to decide the design criteria for ICP torches required for different material processing applications.

Equilibrium statistical mechanics of strongly coupled plasmas by numerical simulation

International Nuclear Information System (INIS)

DeWitt, H.E.

1977-01-01

Numerical experiments using the Monte Carlo method have led to systematic and accurate results for the thermodynamic properties of strongly coupled one-component plasmas and mixtures of two nuclear components. These talks are intended to summarize the results of Monte Carlo simulations from Paris and from Livermore. Simple analytic expressions for the equation of state and other thermodynamic functions have been obtained in which there is a clear distinction between a lattice-like static portion and a thermal portion. The thermal energy for the one-component plasma has a simple power dependence on temperature, (kT)/sup 3 / 4 /, that is identical to Monte Carlo results obtained for strongly coupled fluids governed by repulsive l/r/sup n/ potentials. For two-component plasmas the ion-sphere model is shown to accurately represent the static portion of the energy. Electron screening is included in the Monte Carlo simulations using linear response theory and the Lindhard dielectric function. Free energy expressions have been constructed for one and two component plasmas that allow easy computation of all thermodynamic functions

Study of optical emission spectroscopy with inductively coupled plasma torch

International Nuclear Information System (INIS)

Bauer, M.

1982-01-01

Inductively coupled plasma optical emission spectroscopy is an excellent tool for quantitative multielement trace analysis. This paper describes the performance of a computer-controlled sequential measurement system. Chemical and ionization interferences are shown to be negligible due to the characteristics of the inductively coupled plasma, spectral interferences are eliminated by using a high-resolution monochromator and computer data handling. Good accuracy is achieved for most of the interesting elements, as is shown from both an interlaboratory test and from comparison of the results of water samples from the rivers Elbe and Weser with those achieved with neutron activation and X-ray fluorescence analysis. (orig.) [de

Plasma technology in metallurgical processing

Energy Technology Data Exchange (ETDEWEB)

Haile, O.

1995-12-31

This literature work is mainly focusing on the mechanisms of plasma technology and telling about metallurgical processing, particularly iron and steelmaking as well as the advantage of the unique properties of plasma. The main advantages of plasma technology in metallurgical operations is to direct utilization of naturally available raw materials and fuels without costly upgrading andlor beneficiation, improved environmental impact, improve process control, significant amplification of reactor and process equipment utilization and increased efficiency of raw materials, energy and man power. This literature survey is based on the publication `plasma technology in metallurgical processing` presents a comprehensive account of the physical, electrical, and mechanical aspects of plasma production and practical processing. The applications of plasma technology in metallurgical processing are covered in depth with special emphasis on developments in promising early stages. Plasma technology of today is mature in the metallurgical process applications. A few dramatic improvements are expected in the near future this giving an impetus to the technologists for the long range planning. (18 refs.) (author)

GPU based 3D feature profile simulation of high-aspect ratio contact hole etch process under fluorocarbon plasmas

Science.gov (United States)

Chun, Poo-Reum; Lee, Se-Ah; Yook, Yeong-Geun; Choi, Kwang-Sung; Cho, Deog-Geun; Yu, Dong-Hun; Chang, Won-Seok; Kwon, Deuk-Chul; Im, Yeon-Ho

2013-09-01

Although plasma etch profile simulation has been attracted much interest for developing reliable plasma etching, there still exist big gaps between current research status and predictable modeling due to the inherent complexity of plasma process. As an effort to address this issue, we present 3D feature profile simulation coupled with well-defined plasma-surface kinetic model for silicon dioxide etching process under fluorocarbon plasmas. To capture the realistic plasma surface reaction behaviors, a polymer layer based surface kinetic model was proposed to consider the simultaneous polymer deposition and oxide etching. Finally, the realistic plasma surface model was used for calculation of speed function for 3D topology simulation, which consists of multiple level set based moving algorithm, and ballistic transport module. In addition, the time consumable computations in the ballistic transport calculation were improved drastically by GPU based numerical computation, leading to the real time computation. Finally, we demonstrated that the surface kinetic model could be coupled successfully for 3D etch profile simulations in high-aspect ratio contact hole plasma etching.

Linear coupling of electromagnetic and Jeans modes in self-gravitating plasma streams

International Nuclear Information System (INIS)

Yaroshenko, Victoria V.; Voitenko, Yuriy; Goossens, Marcel

2002-01-01

A new mechanism of linear coupling between electromagnetic (nonpotential) and gravitational disturbances is found for oblique propagation relatively to particle streams. The general dispersion law is derived and applied to the case of two countersteaming dust beams of equal strength and quiasiperpendicular propagation. It reveals a strong linear coupling between the low-frequency aperiodically unstable electromagnetic (AEM) and the Jeans (JM) modes. The coupling is of a mode conversion type, resulting in a frequency gap in the dispersion, and thus significantly modifies the instability criteria. It is shown that, in contrast to the electrostatic case, AEM and JM coupling in streaming self-gravitating plasmas can actually appear even if the plasma frequencies of the dust species greatly exceed the corresponding Jeans frequencies

Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

International Nuclear Information System (INIS)

Wang Hongyu; Sun Peng; Zhao Shuangyun; Li Yang; Jiang Wei

2016-01-01

We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two radio frequency (RF) sources. Particle-in-cell/Monte Carlo (PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects. Some variation and potential application of the discharging configuration is discussed briefly. (paper)

Inductively coupled plasma emission spectroscopy. Part II: applications and fundamentals. Volume 2

International Nuclear Information System (INIS)

Boumans, P.W.J.M.

1987-01-01

This is the second part of the two-volume treatise by this well-known and respected author. This volume reviews applications of inductively coupled plasma atomic emission spectroscopy (ICP-AES), summarizes fundamental studies, and compares ICP-AES methods with other methods of analysis. The first six chapters are devoted to specific fields of application, including the following: metals and other industrial materials, geology, the environment, agriculture and food, biology and clinical analysis, and organic materials. The chapter on the analysis of organic materials also covers the special instrumental considerations required when organic solvents are introduced into an inductively coupled plasma. A chapter on the direct analysis of solids completes the first part of this volume. Each of the applications chapters begins with a summary of the types of samples that are encountered in that field, and the kinds of problems that an elemental analysis can help to solve. This is followed by a tutorial approach covering applicability, advantages, and limitations of the methods. The coverage is thorough, including sample handling, storage, and preparation, acid, and fusion dissolution, avoiding contamination, methods of preconcentration, the types of interferences that can be expected and ways to reduce them, and the types of ICP plasmas that are used. The second half of the volume covers fundamental studies of ICP-AES: basic processes of aerosol generation, plasma modeling and computer simulation, spectroscopic diagnostics, excitation mechanisms, and discharge characteristics. This section introduces the experimental and modeling methods that have been used to obtain fundamental information about ICPs

Determining the microwave coupling and operational efficiencies of a microwave plasma assisted chemical vapor deposition reactor under high pressure diamond synthesis operating conditions

Energy Technology Data Exchange (ETDEWEB)

Nad, Shreya [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824 (United States); Gu, Yajun; Asmussen, Jes [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States)

2015-07-15

The microwave coupling efficiency of the 2.45 GHz, microwave plasma assisted diamond synthesis process is investigated by experimentally measuring the performance of a specific single mode excited, internally tuned microwave plasma reactor. Plasma reactor coupling efficiencies (η) > 90% are achieved over the entire 100–260 Torr pressure range and 1.5–2.4 kW input power diamond synthesis regime. When operating at a specific experimental operating condition, small additional internal tuning adjustments can be made to achieve η > 98%. When the plasma reactor has low empty cavity losses, i.e., the empty cavity quality factor is >1500, then overall microwave discharge coupling efficiencies (η{sub coup}) of >94% can be achieved. A large, safe, and efficient experimental operating regime is identified. Both substrate hot spots and the formation of microwave plasmoids are eliminated when operating within this regime. This investigation suggests that both the reactor design and the reactor process operation must be considered when attempting to lower diamond synthesis electrical energy costs while still enabling a very versatile and flexible operation performance.

Consequences of atomic layer etching on wafer scale uniformity in inductively coupled plasmas

Science.gov (United States)

Huard, Chad M.; Lanham, Steven J.; Kushner, Mark J.

2018-04-01

Atomic layer etching (ALE) typically divides the etching process into two self-limited reactions. One reaction passivates a single layer of material while the second preferentially removes the passivated layer. As such, under ideal conditions the wafer scale uniformity of ALE should be independent of the uniformity of the reactant fluxes onto the wafers, provided all surface reactions are saturated. The passivation and etch steps should individually asymptotically saturate after a characteristic fluence of reactants has been delivered to each site. In this paper, results from a computational investigation are discussed regarding the uniformity of ALE of Si in Cl2 containing inductively coupled plasmas when the reactant fluxes are both non-uniform and non-ideal. In the parameter space investigated for inductively coupled plasmas, the local etch rate for continuous processing was proportional to the ion flux. When operated with saturated conditions (that is, both ALE steps are allowed to self-terminate), the ALE process is less sensitive to non-uniformities in the incoming ion flux than continuous etching. Operating ALE in a sub-saturation regime resulted in less uniform etching. It was also found that ALE processing with saturated steps requires a larger total ion fluence than continuous etching to achieve the same etch depth. This condition may result in increased resist erosion and/or damage to stopping layers using ALE. While these results demonstrate that ALE provides increased etch depth uniformity, they do not show an improved critical dimension uniformity in all cases. These possible limitations to ALE processing, as well as increased processing time, will be part of the process optimization that includes the benefits of atomic resolution and improved uniformity.

Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

International Nuclear Information System (INIS)

Lee, Hee-Jin; Lee, Hyo-Chang; Kim, Young-Cheol; Chung, Chin-Wook

2013-01-01

With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency ω r of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As ω r of the outer resonant coil changes from the non-resonant condition (where ω r is not the driving angular frequency ω rf ) to the resonant condition (where ω r = ω rf ), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer. (fast track communication)

Experiment on dust acoustic solitons in strongly coupled dusty plasma

International Nuclear Information System (INIS)

Boruah, Abhijit; Sharma, Sumita Kumari; Bailung, Heremba

2015-01-01

Dusty plasma, which contains nanometer to micrometer sized dust particles along with electrons and ions, supports a low frequency wave called Dust Acoustic wave, analogous to ion acoustic wave in normal plasma. Due to high charge and low temperature of the dust particles, dusty plasma can easily transform into a strongly coupled state when the Coulomb interaction potential energy exceeds the dust kinetic energy. Dust acoustic perturbations are excited in such strongly coupled dusty plasma by applying a short negative pulse (100 ms) of amplitude 5 - 20 V to an exciter. The perturbation steepens due to nonlinear effect and forms a solitary structure by balancing dispersion present in the medium. For specific discharge conditions, excitation amplitude above a critical value, the perturbation is found to evolve into a number of solitons. The experimental results on the excitation of multiple dust acoustic solitons in the strongly coupled regime are presented in this work. The experiment is carried out in radio frequency discharged plasma produced in a glass chamber at a pressure 0.01 - 0.1 mbar. Few layers of dust particles (∼ 5 μm in diameter) are levitated above a grounded electrode inside the chamber. Wave evolution is observed with the help of green laser sheet and recorded in a high resolution camera at high frame rate. The high amplitude soliton propagates ahead followed by smaller amplitude solitons with lower velocity. The separation between the solitons increases as time passes by. The characteristics of the observed dust acoustic solitons such as amplitude-velocity and amplitude- Mach number relationship are compared with the solutions of Korteweg-de Vries (KdV) equation. (author)

Modeling and simulation of plasma materials processing devices

International Nuclear Information System (INIS)

Graves, D.B.

1996-01-01

Plasma processing has emerged as a central technology in the manufacture of integrated circuits (ICs) and related industries. These plasmas are weakly to partially ionized gases, typically operated at a few to several hundred mTorr gas pressure, with neutral temperatures ranging from room temperature to 500 degrees K. Electron mean energies are typically a few eV and ion energies in the bulk plasma are about 0.05-0.5 eV. Positive ions axe accelerated in the sheaths to impact surfaces with energies ranging from about 10 eV to hundreds of eV. These energetic ions profoundly affect rates of surface chemical reactions. One of the consequences of the recent rapid growth in the IC industry has been a greater focus on manufacturing productivity. The capital costs of equipment that is used in manufacturing IC's has become a large fraction of the ∼ $1 billion cost of building a wafer fab. There is now a strong economic incentive to develop workstation-based simulations of plasma chemical reactors in order to design, optimize and control plasma reactors. I will summarize efforts to develop such models, including electromagnetic coupling, and transport and kinetics of charged and neutral species. Length and time scale disparities in the plasma tool challenge current simulation approaches, and I will address strategies to attack aspects of this problem. In addition, I will present some of our recent efforts to exploit molecular dynamics simulations employing empirical potentials to get hints about qualitative mechanisms and ideas on how to formulate rate expressions for plasma-surface chemical processes. Video illustrations of selected sets of ion trajectories impacting near-surface regions of the substrate will be presented

Jet quenching in a strongly coupled anisotropic plasma

Science.gov (United States)

Chernicoff, Mariano; Fernández, Daniel; Mateos, David; Trancanelli, Diego

2012-08-01

The jet quenching parameter of an anisotropic plasma depends on the relative orientation between the anisotropic direction, the direction of motion of the parton, and the direction along which the momentum broadening is measured. We calculate the jet quenching parameter of an anisotropic, strongly coupled {N} = 4 plasma by means of its gravity dual. We present the results for arbitrary orientations and arbitrary values of the anisotropy. The anisotropic value can be larger or smaller than the isotropic one, and this depends on whether the comparison is made at equal temperatures or at equal entropy densities. We compare our results to analogous calculations for the real-world quark-gluon plasma and find agreement in some cases and disagreement in others.

Mass spectrometric evidence for suprathermal ionization in an inductively coupled argon plasma

International Nuclear Information System (INIS)

Houk, R.S.; Svec, H.J.; Fassel, V.A.

1981-01-01

Mass spectra have been obtained of species in the axial channel of an inductively coupled argon plasma by extracting ions from the inductively coupled plasma into a vacuum system housing a quadrupole mass spectrometer. Ionization temperatures (T/sub ion/) are obtained from relative count rates of m/z-resolved ions according to two general types of ionization equilibrium considerations: (a) the radio of doubly/singly charged ions of the same element, and (b) the ratio of singly charged ions from two elements of different ionization energy. The T/sub ion/ values derived from measurement of Ar +2 /Ar + , Ba +2 /Ba + , Sr +2 /Sr + , and Cd + /I + are all greater than those expected from excitation temperatures measured by other workers. The latter three values for T/sub ion/ are in reasonable agreement with values obtained by optical spectrometry for a variety of argon inductively coupled plasmas

Capillary electrophoresis - inductively coupled plasma mass spectrometry (CE-ICPMS) coupling to assess pentavalent actinides thermodynamic constants

International Nuclear Information System (INIS)

Topin, S.; Baglan, N.; Aupiais, J.

2009-01-01

Full text: Aiming to investigate plutonium speciation at trace levels, we coupled capillary electrophoresis, a high resolution separation technique with inductively coupled plasma mass spectrometry, a detector with high sensitivity for plutonium. The research work performed to optimize the coupling is discussed based on the following criteria: the migration time, the resolution and the detection limit. The capabilities of the analytical tool are demonstrated by determining thermodynamic constants for pentavalent plutonium, and neptunium as a reference, in the presence of inorganic ligands. (author)

Purification of the gas after pyrolysis in coupled plasma-catalytic system

Directory of Open Access Journals (Sweden)

Młotek Michał

2017-12-01

Full Text Available Gliding discharge and coupled plasma-catalytic system were used for toluene conversion in a gas composition such as the one obtained during pyrolysis of biomass. The chosen catalyst was G-0117, which is an industrial catalyst for methane conversion manufactured by INS Pulawy (Poland. The effects of discharge power, initial concentration of toluene, gas flow rate and the presence of the bed of the G-0117 catalyst on the conversion of C7H8, a model tars compounds were investigated. Conversion of coluene increases with discharge power and the highest one was noted in the coupled plasma-catalytic system. It was higher than that in the homogeneous system of gliding discharge. When applying a reactor with reduced G-0117 and CO (0.15 mol%, CO2 (0.15 mol%, H2 (0.30 mol%, N2 (0.40 mol%, 4000 ppm of toluene and gas flow rate of 1.5 Nm3/h, the conversion of toluene was higher than 99%. In the coupled plasma-catalytic system with G-0117 methanation of carbon oxides was observed.

Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni

Science.gov (United States)

Loch, D. A. L.; Aranda Gonzalvo, Y.; Ehiasarian, A. P.

2017-06-01

Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The ion energy distribution functions (IEDFs) were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5%. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time-dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse.

Oscillatory processes in plasma

International Nuclear Information System (INIS)

Gallin, E.

1980-01-01

The oscillatory process play an important part in plasma evolution, In hot plasma in particular, the interactions between the oscillation modes are preponderant in relation to the binary collisions between particles. The nonlineary interactions between collective plasma oscillations can generate, in this case, a non-balanced steady state of plasma (steady turbulence). The paper elucidates some aspects of the oscillatory phenomena which contribute to the plasma state evolution, especially of hot plasma. A major part of the paper is devoted to the study of parametric instabilities in plasma and their role in increasing the temperature of plasma components (electrons, ions). Both parametric instabilities in plasma in the vicinity of thermodynamic balance and parametric processes is steady turbulent plasma are analysed - in relation to additional heating of hot plasma. An important result of the thesis refers to the drowing-up of a non-lineary interaction model between the oscillation modes in turbulent plasma, being responsible for the electromagnetic radiation in hot plasma. On the basis of the model suggested in the paper the existence of a low frequency radiative mode in hot plasma in a turbulent state, can be demonstrated. Its frequency could be even lower than plasma frequency in the field of long waves be even lower than plasma frequency in the field of long waves. Such a radiative mode was detected experimentally in focussed plasma installations. (author)

Plasma processing: Technologies and applications

International Nuclear Information System (INIS)

Naddaf, M.; Saloum, S.

2005-01-01

This study aims to present the fundamentals of physics of plasmas, methods of generation, diagnostics, and applications for processing of materials. The first chapter defines plasma in general as well as its main parameters, the most important differential equations in plasma physics, and classifies the types of plasmas. the various methods and techniques to create and sustain plasma are presented in the second chapter. Chapter 3 focuses on plasma diagnostic methods and tools. While chapter 4 deals with applications of plasma processing such as; surface modification of materials, plasma ashing and etching, plasma cutting, and the environmental applications of plasma. Plasma polymerization and its various applications have been presented in more details in the last chapter. (Author)

Nonlinear Raman scattering behavior with Langmuir and sound waves coupling in a homogeneous plasma

International Nuclear Information System (INIS)

Bonnaud, G.; Pesme, D.; Pellat, R.

1990-01-01

By means of wave-coupling simulations, the typical nonlinear evolution of stimulated Raman scattering (SRS) is investigated in a homogeneous sub-quarter-critical plasma for present-day low laser irradiances and kilo-electron-volt electron temperatures. The decrease of the Langmuir energy observed after the SRS growth is found to be basically the result of the electrostatic decay instability (EDI) onset, which generates a high-amplitude ion-acoustic wave. The resulting strong modulation of the plasma density causes a conversion process that transforms the initial one-wave-vector Langmuir wave driven by SRS into a Bloch wave and induces SRS detuning and larger damping. The conditions involved herein have allowed isolation of these processes from the modulational instability; in addition, the Langmuir collapse is found not to occur owing to the high electron temperature

Collisional processes in supersymmetric plasma

International Nuclear Information System (INIS)

Czajka, Alina; Mrowczynski, Stanislaw

2011-01-01

Collisional processes in ultrarelativistic N=1 supersymmetric QED plasma are studied and compared to those in an electromagnetic plasma of electrons, positrons and photons. Cross sections of all binary interactions which occur in the supersymmetric plasma at the order of e 4 are computed. Some processes, in particular, the Compton scattering on selectrons, appear to be independent of momentum transfer and thus they are qualitatively different from processes in an electromagnetic plasma. It suggests that the transport properties of the supersymmetric plasma are different than those of its nonsupersymmetric counterpart. Energy loss and momentum broadening of a particle traversing the supersymmetric plasma are discussed in detail and the characteristics are shown to be surprisingly similar to those of QED plasma.

Continuum Lowering and Fermi-Surface Rising in Strongly Coupled and Degenerate Plasmas

International Nuclear Information System (INIS)

Hu, S. X.

2017-01-01

Here, continuum lowering is a well-known and important physics concept that describes the ionization potential depression (IPD) in plasmas caused by thermal-/pressure-induced ionization of outer-shell electrons. The existing IPD models are often used to characterize plasma conditions and to gauge opacity calculations. Recent precision measurements have revealed deficits in our understanding of continuum lowering in dense hot plasmas. However, these investigations have so far been limited to IPD in strongly coupled but nondegenerate plasmas. Here, we report a first-principles study of the K-edge shifting in both strongly coupled and fully degenerate carbon plasmas, with quantum molecular dynamics (QMD) calculations based on the all-electron density-functional theory (DFT). The resulted K-edge shifting versus plasma density, as a probe to the continuum lowering and the Fermi-surface rising, is found to be significantly different from predictions of existing IPD models. In contrast, a simple model of “single atom in box” (SAIB), developed in this work, accurately predicts K-edge locations as what ab-initio calculations provide.

Study of the linear and non-linear coupling of the LH wave to the tokamak plasmas

International Nuclear Information System (INIS)

Preynas, M.

2012-10-01

In order to achieve long pulse operation with a tokamak, additional heating and current drive systems are necessary. High frequency antennas, which deliver several megawatts of power to the plasma, are currently used in several tokamaks. Moreover, a good control of the coupling of the wave launched by the antenna to the edge plasma is required to optimize the efficiency of heating and current drive LH systems. However, non-linear effects which depend on the level of injected power in the plasma strongly damage the coupling of the LH wave at particular edge parameters (density and temperature profiles). Results presented in the manuscript deal with the study of the linear and non-linear coupling of the LH wave to the plasma. In the framework of the commissioning of the Passive Active Multijunction antenna in 2009 on the Tore Supra tokamak aiming at validating the LH system suggested for ITER, the characterisation of its coupling properties was realized from low power experiments. The experimental results, which are compared with the linear coupling code ALOHA, have validated the theoretical predictions of good coupling at edge plasma density around the cut-off density. Besides, the ponderomotive effect is clearly identified as responsible for the deterioration in the coupling of the wave, which is measured under particular edge plasma conditions. A theoretical model combining the coupling of the LH wave with the ponderomotive force is suggested to explain the experimental observations. Thus, a new full wave code (named PICCOLO-2D) was developed and results from simulations validate the working hypothesis of the contribution of the ponderomotive effect in the non-linear observations of LHCD coupling on Tore Supra. (author)

Measurement of the surface charge accumulation using anodic aluminum oxide(AAO) structure in an inductively coupled plasma

Science.gov (United States)

Park, Ji-Hwan; Oh, Seung-Ju; Lee, Hyo-Chang; Kim, Yu-Sin; Kim, Young-Cheol; Kim, June Young; Ha, Chang-Seoung; Kwon, Soon-Ho; Lee, Jung-Joong; Chung, Chin-Wook

2014-10-01

As the critical dimension of the nano-device shrinks, an undesired etch profile occurs during plasma etch process. One of the reasons is the local electric field due to the surface charge accumulation. To demonstrate the surface charge accumulation, an anodic aluminum oxide (AAO) membrane which has high aspect ratio is used. The potential difference between top electrode and bottom electrode in an anodic aluminum oxide contact structure is measured during inductively coupled plasma exposure. The voltage difference is changed with external discharge conditions, such as gas pressure, input power, and gas species and the result is analyzed with the measured plasma parameters.

Jets in a strongly coupled anisotropic plasma

Energy Technology Data Exchange (ETDEWEB)

Fadafan, Kazem Bitaghsir [Shahrood University of Technology, Faculty of Physics, Shahrood (Iran, Islamic Republic of); University of Southampton, STAG Research Centre Physics and Astronomy, Southampton (United Kingdom); Morad, Razieh [University of Cape Town, Department of Physics, Rondebosch (South Africa)

2018-01-15

In this paper, we study the dynamics of the light quark jet moving through the static, strongly coupled N = 4, anisotropic plasma with and without charge. The light quark is presented by a 2-parameters point-like initial condition falling string in the context of the AdS/CFT. We calculate the stopping distance of the light quark in the anisotropic medium and compare it with its isotropic value. We study the dependency of the stopping distance to the both string initial conditions and background parameters such as anisotropy parameter or chemical potential. Although the typical behavior of the string in the anisotropic medium is similar to the one in the isotropic AdS-Sch background, the string falls faster to the horizon depending on the direction of moving. Particularly, the enhancement of quenching is larger in the beam direction. We find that the suppression of stopping distance is more prominent when the anisotropic plasma have the same temperature as the isotropic plasma. (orig.)

On coupling fluid plasma and kinetic neutral physics models

Directory of Open Access Journals (Sweden)

I. Joseph

2017-08-01

Full Text Available The coupled fluid plasma and kinetic neutral physics equations are analyzed through theory and simulation of benchmark cases. It is shown that coupling methods that do not treat the coupling rates implicitly are restricted to short time steps for stability. Fast charge exchange, ionization and recombination coupling rates exist, even after constraining the solution by requiring that the neutrals are at equilibrium. For explicit coupling, the present implementation of Monte Carlo correlated sampling techniques does not allow for complete convergence in slab geometry. For the benchmark case, residuals decay with particle number and increase with grid size, indicating that they scale in a manner that is similar to the theoretical prediction for nonlinear bias error. Progress is reported on implementation of a fully implicit Jacobian-free Newton–Krylov coupling scheme. The present block Jacobi preconditioning method is still sensitive to time step and methods that better precondition the coupled system are under investigation.

Microwave power coupling in a surface wave excited plasma

Directory of Open Access Journals (Sweden)

Satyananda Kar

2015-01-01

Full Text Available In recent decades, different types of plasma sources have been used for various types of plasma processing, such as, etching and thin film deposition. The critical parameter for effective plasma processing is high plasma density. One type of high density plasma source is Microwave sheath-Voltage combination Plasma (MVP. In the present investigation, a better design of MVP source is reported, in which over-dense plasma is generated for low input microwave powers. The results indicate that the length of plasma column increases significantly with increase in input microwave power.

Beam-plasma coupling physics in support of active experiments

Science.gov (United States)

Yakymenko, K.; Delzanno, G. L.; Roytershteyn, V.

2017-12-01

The recent development of compact relativistic accelerators might open up a new era of active experiments in space, driven by important scientific and national security applications. Examples include using electron beams to trace magnetic field lines and establish causality between physical processes occurring in the magnetosphere and those in the ionosphere. Another example is the use of electron beams to trigger waves in the near-Earth environment. Waves could induce pitch-angle scattering and precipitation of energetic electrons, acting as an effective radiation belt remediation scheme. In this work, we revisit the coupling between an electron beam and a magnetized plasma in the framework of linear cold-plasma theory. We show that coupling can occur through two different regimes. In the first, a non-relativistic beam radiates through whistler waves. This is well known, and was in fact the focus of many rockets and space-shuttle campaigns aimed at demonstrating whistler emissions in the eighties. In the second regime, the beam radiates through extraordinary (R-X) modes. Nonlinear simulations with a highly-accurate Vlasov code support the theoretical results qualitatively and demonstrate that the radiated power through R-X modes can be much larger than in the whistler regime. Test-particle simulations in the wave electromagnetic field will also be presented to assess the efficiency of these waves in inducing pitch-angle scattering via wave-particle interactions. Finally, the implications of these results for a rocket active experiment in the ionosphere and for a radiation belt remediation scheme will be discussed.

Measurements of time average series resonance effect in capacitively coupled radio frequency discharge plasma

International Nuclear Information System (INIS)

Bora, B.; Bhuyan, H.; Favre, M.; Wyndham, E.; Chuaqui, H.; Kakati, M.

2011-01-01

Self-excited plasma series resonance is observed in low pressure capacitvely coupled radio frequency discharges as high-frequency oscillations superimposed on the normal radio frequency current. This high-frequency contribution to the radio frequency current is generated by a series resonance between the capacitive sheath and the inductive and resistive bulk plasma. In this report, we present an experimental method to measure the plasma series resonance in a capacitively coupled radio frequency argon plasma by modifying the homogeneous discharge model. The homogeneous discharge model is modified by introducing a correction factor to the plasma resistance. Plasma parameters are also calculated by considering the plasma series resonances effect. Experimental measurements show that the self-excitation of the plasma series resonance, which arises in capacitive discharge due to the nonlinear interaction of plasma bulk and sheath, significantly enhances both the Ohmic and stochastic heating. The experimentally measured total dissipation, which is the sum of the Ohmic and stochastic heating, is found to increase significantly with decreasing pressure.

Spectroanalytical investigations on inductively coupled N2/Ar and Ar/Ar high frequency plasmas

International Nuclear Information System (INIS)

Malinowski, P.; Mazurkiewicz, M.; Nickel, H.

1981-03-01

In order to improve the detection limits of trace elements in corrosion products of metallic materials, the inductively coupled plasma excitation source (ICP) was applied for spectroscopic analysis. Besides optimizing the working conditions for the mentioned materials, the fundamental research clearing the excitation processes in ICP was carried out. Basicly, two plasma systems were investigated: the nitrogen cooled N 2 /Ar- and pure Ar/Ar-plasma. The computed detection limits for 8 chosen elements are between 0.1 and 50 μg ml -1 in both plasmas. The advantage of ion lines was clearly present; in N 2 /Ar-plasma it was larger than in Ar/Ar-plasma. The excitation temperatures measured with help of ArI, FeI and ZnI lines rise with increasing power and decreasing distance from the induction coil. The distribution of Zn excitation temperature in N 2 /Ar-plasma as well as the measured N + 2 rotational and CN vibrational temperatures indicate, that the toroidal structure of Ar/Ar-plasma is not analogue to the N 2 /Ar-plasma. The values of the various excitation temperatures (Ar, Fe, Zn) and the differences between the excitation, vibration, rotation and ionization temperatures (Tsub(i) > Tsub(n) = Tsub(vib) > Tsub(rot)) indicate an absence of thermal equilibrium in the concerned system. (orig.)

Simulation study of MHD relaxation and reconnection processes in RFP plasma

International Nuclear Information System (INIS)

Kusano, Kanya; Kunimoto, Kaito; Suzuki, Yoshio; Tamano, Teruo; Sato, Tetsuya

1991-01-01

The authors have studied several nonlinear processes in RFP plasma through the use of 3D MHD simulations. In particular, they have shed light on: (1) dynamo and self-sustainment in reversed-field pinch (RFP), (2) phase locking process in MHD relaxation, and (3) the heating and acceleration in magnetic reconnection process. First, the contributions of the kink (m = 1) mode (linearly unstable) and of the m = 0 mode (driven by nonlinear coupling) to the dynamo are qualitatively evaluated using a high accuracy simulation. It is found that, if the free energy to drive kink instabilities is as small as that in the actual experimental plasma, the m = 0 modes, driven nonlinearly, play a more important role for the flux generation than the kink modes. Secondly, numerical simulations of the self-sustainment process in a RFP are performed. It is confirmed that the self-sustainment process is a coherent oscillating process composed of the MHD relaxation and the resistive diffusion processes. Toroidal phase locking process of kink modes is numerically observed in simulations of self-reversal and self-sustainment processes. It has characteristics similar to the slinky mode observed in the OHTE experiment. A detailed investigation reveals that nonlinear coupling between the most unstable two kink modes governs the entire dynamics in all kink modes and leads to the phase locking process. They find that reconnection can accelerate plasma over a local Alfven speed. This is a result of the fact that the magnetic field in the downstream area plays a similar role to de Laval nozzle. They also investigate the heating mechanisms in reconnection process. It is revealed that the viscous heating rate is as large as the joule heating rate in the reconnection process. This result implies that the viscous heating in the reconnection process is an important candidate for the mechanism to explain the RFP experiments where the ion temperatures is higher than the electron temperature

Modelling of plasma-antenna coupling and non-linear radio frequency wave-plasma-wall interactions in the magnetized plasma device under ion cyclotron range of frequencies

International Nuclear Information System (INIS)

Lu, LingFeng

2016-01-01

Ion Cyclotron Resonant Heating (ICRH) by waves in 30-80 MHz range is currently used in magnetic fusion plasmas. Excited by phased arrays of current straps at the plasma periphery, these waves exist under two polarizations. The Fast Wave tunnels through the tenuous plasma edge and propagates to its center where it is absorbed. The parasitically emitted Slow Wave only exists close to the launchers. How much power can be coupled to the center with 1 A current on the straps? How do the emitted radiofrequency (RF) near and far fields interact parasitically with the edge plasma via RF sheath rectification at plasma-wall interfaces? To address these two issues simultaneously, in realistic geometry over the size of ICRH antennas, this thesis upgraded and tested the Self-consistent Sheaths and Waves for ICH (SSWICH) code. SSWICH couples self-consistently RF wave propagation and Direct Current (DC) plasma biasing via non-linear RF and DC sheath boundary conditions (SBCs) at plasma/wall interfaces. Its upgrade is full wave and was implemented in two dimensions (toroidal/radial). New SBCs coupling the two polarizations were derived and implemented along shaped walls tilted with respect to the confinement magnetic field. Using this new tool in the absence of SBCs, we studied the impact of a density decaying continuously inside the antenna box and across the Lower Hybrid (LH) resonance. Up to the memory limits of our workstation, the RF fields below the LH resonance changed with the grid size. However the coupled power spectrum hardly evolved and was only weakly affected by the density inside the box. In presence of SBCs, SSWICH-FW simulations have identified the role of the fast wave on RF sheath excitation and reproduced some key experimental observations. SSWICH-FW was finally adapted to conduct the first electromagnetic and RF-sheath 2D simulations of the cylindrical magnetized plasma device ALINE. (author) [fr

Inductively and capacitively coupled plasmas at interface: A comparative study towards highly efficient amorphous-crystalline Si solar cells

Science.gov (United States)

Guo, Yingnan; Ong, Thiam Min Brian; Levchenko, I.; Xu, Shuyan

2018-01-01

A comparative study on the application of two quite different plasma-based techniques to the preparation of amorphous/crystalline silicon (a-Si:H/c-Si) interfaces for solar cells is presented. The interfaces were fabricated and processed by hydrogen plasma treatment using the conventional plasma-enhanced chemical vacuum deposition (PECVD) and inductively coupled plasma chemical vapour deposition (ICP-CVD) methods The influence of processing temperature, radio-frequency power, treatment duration and other parameters on interface properties and degree of surface passivation were studied. It was found that passivation could be improved by post-deposition treatment using both ICP-CVD and PECVD, but PECVD treatment is more efficient for the improvement on passivation quality, whereas the minority carrier lifetime increased from 1.65 × 10-4 to 2.25 × 10-4 and 3.35 × 10-4 s after the hydrogen plasma treatment by ICP-CVD and PECVD, respectively. In addition to the improvement of carrier lifetimes at low temperatures, low RF powers and short processing times, both techniques are efficient in band gap adjustment at sophisticated interfaces.

Serum/plasma methylmercury determination by isotope dilution gas chromatography-inductively coupled plasma mass spectrometry

Energy Technology Data Exchange (ETDEWEB)

Baxter, Douglas C., E-mail: douglas.baxter@alsglobal.com [ALS Scandinavia AB, Aurorum 10, 977 75 Lulea (Sweden); Faarinen, Mikko [ALS Scandinavia AB, Aurorum 10, 977 75 Lulea (Sweden); Osterlund, Helene; Rodushkin, Ilia [ALS Scandinavia AB, Aurorum 10, 977 75 Lulea (Sweden); Division of Geosciences, Lulea University of Technology, 977 87 Lulea (Sweden); Christensen, Morten [ALS Scandinavia AB, Maskinvaegen 2, 183 53 Taeby (Sweden)

2011-09-09

Highlights: {center_dot} We determine methylmercury in serum and plasma using isotope dilution calibration. {center_dot} Separation by gas chromatography and detection by inductively coupled plasma mass spectrometry. {center_dot} Data for 50 specimens provides first reference range for methylmercury in serum. {center_dot} Serum samples shown to be stable for 11 months in refrigerator. - Abstract: A method for the determination of methylmercury in plasma and serum samples was developed. The method uses isotope dilution with {sup 198}Hg-labeled methylmercury, extraction into dichloromethane, back-extraction into water, aqueous-phase ethylation, purge and trap collection, thermal desorption, separation by gas chromatography, and mercury isotope specific detection by inductively coupled plasma mass spectrometry. By spiking 2 mL sample with 1.2 ng tracer, measurements in a concentration interval of (0.007-2.9) {mu}g L{sup -1} could be performed with uncertainty amplification factors <2. A limit of quantification of 0.03 {mu}g L{sup -1} was estimated at 10 times the standard deviation of concentrations measured in preparation blanks. Within- and between-run relative standard deviations were <10% at added concentration levels of 0.14 {mu}g L{sup -1}, 0.35 {mu}g L{sup -1} and 2.8 {mu}g L{sup -1}, with recoveries in the range 82-110%. Application of the method to 50 plasma/serum samples yielded a median (mean; range) concentration of methylmercury of 0.081 (0.091; <0.03-0.19) {mu}g L{sup -1}. This is the first time methylmercury has been directly measured in this kind of specimen, and is therefore the first estimate of a reference range.

A secondary fuel removal process: plasma processing

Energy Technology Data Exchange (ETDEWEB)

Min, J Y; Kim, Y S [Hanyang Univ., Seoul (Korea, Republic of); Bae, K K; Yang, M S [Korea Atomic Energy Research Institute, Taejon (Korea, Republic of)

1997-07-01

Plasma etching process of UO{sub 2} by using fluorine containing gas plasma is studied as a secondary fuel removal process for DUPIC (Direct Use of PWR spent fuel Into Candu) process which is taken into consideration for potential future fuel cycle in Korea. CF{sub 4}/O{sub 2} gas mixture is chosen for reactant gas and the etching rates of UO{sub 2} by the gas plasma are investigated as functions of CF{sub 4}/O{sub 2} ratio, plasma power, substrate temperature, and plasma gas pressure. It is found that the optimum CF{sub 4}/O{sub 2} ratio is around 4:1 at all temperatures up to 400 deg C and the etching rate increases with increasing r.f. power and substrate temperature. Under 150W r.f. power the etching rate reaches 1100 monolayers/min at 400 deg C, which is equivalent to about 0.5mm/min. (author).

Antenna coupling study for ICWC plasma characterization in TEXTOR

Indian Academy of Sciences (India)

2015-11-27

Home; Journals; Pramana – Journal of Physics; Volume 80; Issue 1. Antenna coupling study for ICWC plasma characterization in ... Proceedings of the International Workshop/Conference on Computational Condensed Matter Physics and Materials Science (IWCCMP-2015). Posted on November 27, 2015. Guest Editors: ...

Slow wave antenna coupling to ion Bernstein waves for plasma heating in ICRF

International Nuclear Information System (INIS)

Sy, W.N-C.; Amano, T.; Ando, R.; Fukuyama, A.; Watari, T.

1984-10-01

The coupling of ICRF power from a slow wave antenna to a plasma with finite temperature is examined theoretically and compared to an independent computer calculation. It is shown that such antennas can be highly efficient in trasferring most of the antenna power directly to ion Bernstein waves, with only a very small fraction going into fast waves. The potentiality of this coupling scheme for plasma heating in ICRF is briefly discussed. (author)

The plasma physics of plasma processing

International Nuclear Information System (INIS)

Shohet, L.

1991-01-01

Plasma processing is used for producing new materials with unusual and superior properties, for developing new chemical compounds and processes, for machining, and for altering and refining materials and surfaces. It has direct applications to semiconductor fabrication, materials synthesis, welding, lighting, polymers, anti-corrosion coatings, machine tools, metallurgy, electrical and electronics devices, hazardous waste removal, high performance ceramics, and many other items in both high-technology and the more traditional industries. Plasma processing takes on a wide variety of apparently different forms in industry, but the techniques share many common characteristics and problems. Control of the generation and flux of ions, electrons and free radicals in the plasma and their incidence on a surface is vital. Diagnostics, sensors, modeling techniques, and associated statistical methods are needed. However, without an in-depth understanding of the variety of phenomena taking place and their application to the industrial environment, advances in this technology, and its efficient use, will occur at a diminishing rate

Investigations on the pyrolysis of hydrocarbons in the inductive coupled RF-plasma and the deposited pyrocarbon

International Nuclear Information System (INIS)

Eisgruber, H.; Mazurkiewicz, M.; Nickel, H.

1979-08-01

The pyrocarbon coatings of the nuclear fuel particles for the High-Temperature Reactor (HTR) are produced by pyrolysis of hydrocarbons under high temperatures. The investigations of the inductive coupled argon or argon/hydrocarbon-plasma performed in the frame of this work deliver a contribution for the clarification of pyrolysis processes and the production of pyrolytic carbons in the plasma of an electric discharge. The argon-plasma, as high-temperature source, is diagnosed theoretically and emission-spectroscopically. To the pure argon-plasma the various hydrocarbons are added. Due to the thermal decomposition the carbon is separated in solid form. The structure of the deposited pyrocarbon is composed of different components. The depositions are characterised with the principles in use at the IRW and are assigned to the fluidized bed pyrocarbons as fas as possible. (orig.) [de

Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas

International Nuclear Information System (INIS)

Kim, Youngsoo; Lee, Ji-Hye; Kim, Kang-Jin; Lee, Yeonhee

2009-01-01

Different fluorocarbon thin films were deposited on Si substrates using a plasma-polymerization method. Fluorine-containing hydrophobic thin films were obtained by inductively coupled plasma (ICP) and pulsed plasma (PP) with a mixture of fluorocarbon precursors C 2 F 6 , C 3 F 8 , and c-C 4 F 8 and the unsaturated hydrocarbons of C 2 H 2 . The influence on the fluorocarbon surfaces of the process parameters for plasma polymerization, including the gas ratio and the plasma power, were investigated under two plasma-polymerized techniques with different fluorocarbon gas precursors. The hydrophobic properties, surface morphologies, and chemical compositions were elucidated using water contact angle measurements, field emission-scanning electron microscope, x-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FT-IR), and time-of-flight secondary ion mass spectrometry (TOF-SIMS). In this study, the ICP technique provides coarser grained films and more hydrophobic surfaces as well as a higher deposition rate compared to the PP technique. XPS, FT-IR, and TOF-SIMS analyses indicated that the ICP technique produced more fluorine-related functional groups, including CF 2 and CF 3 , on the surface. From the curve-fitted XPS results, fluorocarbon films grown under ICP technique exhibited less degree of cross-linking and higher CF 2 concentrations than those grown under PP technique.

Plutonium bioassay by inductively coupled plasma mass spectrometry ICP/MS

International Nuclear Information System (INIS)

Wyse, E.J.; Fisher, D.R.

1993-04-01

The determination of plutonium in urine poses several analytical challenges, e.g., detectability, matrix, etc. We have investigated the feasibility of analyzing plutonium in processed urine by inductively coupled plasma mass spectrometry (ICP/MS). The urine samples are first spiked with 244 Pu as a tracer and internal standard, then processed by co-precipitation and column chromatography using TRU-Spec trademark, an extraction resin. By enhancing ICP/MS detection capabilities via improved sample introduction and data acquisition efficiencies, an instrumental detection limit of 5 to 50 fg (0.3 to 3 fCi for 239 pu) is typically obtained, depending on the desired degree of quantitation. A brief summary of the analytical method as well as the basis for measuring radionuclides by ICP/MS are submitted; the separation procedure, methods of sample introduction, and data acquisition techniques are then highlighted

Radiation from nonlinear coupling of plasma waves

International Nuclear Information System (INIS)

Fung, S.F.

1986-01-01

The author examines the generation of electromagnetic radiation by nonlinear resonant interactions of plasma waves in a cold, uniformly magnetized plasma. In particular, he considers the up-conversion of two electrostatic wave packets colliding to produce high frequency electromagnetic radiation. Efficient conversion of electrostatic to electromagnetic wave energy occurs when the pump amplitudes approach and exceed the pump depletion threshold. Results from the inverse scattering transform analysis of the three-wave interaction equations are applied. When the wave packets are initially separated, the fully nonlinear set of coupling equations, which describe the evolution of the wave packets, can be reduced to three separate eigenvalue problems; each can be considered as a scattering problem, analogous to eh Schroedinger equation. In the scattering space, the wave packet profiles act as the scattering potentials. When the wavepacket areas approach (or exceed) π/2, the wave functions are localized (bound states) and the scattering potentials are said to contain solitons. Exchange of solitons occurs during the interaction. The transfer of solitons from the pump waves to the electromagnetic wave leads to pump depletion and the production of strong radiation. The emission of radio waves is considered by the coupling of two upper-hybrid branch wave packets, and an upper-hybrid and a lower hybrid branch wave packet

Analysis of non-equilibrium phenomena in inductively coupled plasma generators

Energy Technology Data Exchange (ETDEWEB)

Zhang, W.; Panesi, M., E-mail: mpanesi@illinois.edu [University of Illinois at Urbana-Champaign, Urbana, Illinois 61822 (United States); Lani, A. [Von Karman Institute for Fluid Dynamics, Rhode-Saint-Genèse (Belgium)

2016-07-15

This work addresses the modeling of non-equilibrium phenomena in inductively coupled plasma discharges. In the proposed computational model, the electromagnetic induction equation is solved together with the set of Navier-Stokes equations in order to compute the electromagnetic and flow fields, accounting for their mutual interaction. Semi-classical statistical thermodynamics is used to determine the plasma thermodynamic properties, while transport properties are obtained from kinetic principles, with the method of Chapman and Enskog. Particle ambipolar diffusive fluxes are found by solving the Stefan-Maxwell equations with a simple iterative method. Two physico-mathematical formulations are used to model the chemical reaction processes: (1) A Local Thermodynamics Equilibrium (LTE) formulation and (2) a thermo-chemical non-equilibrium (TCNEQ) formulation. In the TCNEQ model, thermal non-equilibrium between the translational energy mode of the gas and the vibrational energy mode of individual molecules is accounted for. The electronic states of the chemical species are assumed in equilibrium with the vibrational temperature, whereas the rotational energy mode is assumed to be equilibrated with translation. Three different physical models are used to account for the coupling of chemistry and energy transfer processes. Numerical simulations obtained with the LTE and TCNEQ formulations are used to characterize the extent of non-equilibrium of the flow inside the Plasmatron facility at the von Karman Institute. Each model was tested using different kinetic mechanisms to assess the sensitivity of the results to variations in the reaction parameters. A comparison of temperatures and composition profiles at the outlet of the torch demonstrates that the flow is in non-equilibrium for operating conditions characterized by pressures below 30 000 Pa, frequency 0.37 MHz, input power 80 kW, and mass flow 8 g/s.

AETHER: A simulation platform for inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Turkoz, Emre, E-mail: emre.turkoz@boun.edu.tr; Celik, Murat

2015-04-01

An in-house code is developed to simulate the inductively coupled plasma (ICP). The model comprises the fluid, electromagnetic and transformer submodels. Fluid equations are solved to evaluate the plasma flow parameters, including the plasma and neutral densities, ion and neutral velocities, electron flux, electron temperature, and electric potential. The model relies on the ambipolar approximation and offers the evaluation of plasma parameters without solving the sheath region. The electromagnetic model handles the calculation of the electric and magnetic fields using the magnetic vector potential. The transformer model captures the effect of the matching circuit utilized in laboratory experiments for RF power deposition. The continuity and momentum equations are solved using finite volume method. The energy, electric potential, and magnetic vector potential equations are solved using finite difference method. The resulting linear systems of equations are solved with iterative solvers including Jacobi and GMRES. The code is written using the C++ programming language, it works in parallel and has graphical user interface. The model is applied to study ICP characteristics of a plasma confined within a cylindrical chamber with dielectric walls for two different power deposition cases. The results obtained from the developed model are verified using the plasma module of COMSOL Multiphysics. The model is also applied to a plasma source configuration, and it is demonstrated that there is an overall increase in the plasma potential when current is extracted from ICP with a biased wall electrode.

Plasma processing and chemistry

NARCIS (Netherlands)

Schram, D.C.; Mullen, van der J.J.A.M.; Sanden, van de M.C.M.

1994-01-01

The growing field of applications of plasma as deposition, etching, surface modification and chemical conversion has stimulated a renewed interest in plasma science in the atomic physical chemistry regime. The necessity to optimize the various plasma processing techniques in terms of rates, and

Performance assessment of coupled processes

International Nuclear Information System (INIS)

Pigford, T.H.

1987-01-01

The author considers all processes to be coupled. For example, a waste package heats the surrounding rock and its pore water, creating gradients in density and pressure that result in increased water flow. That process can be described as coupled, in that the flow is a consequence of heating. In a narrower sense, one speaks also of the more weakly coupled transport processes, expressed by the Onsager reciprocal relations, that state that a transport current, i.e., flux, of heat is accompanied by a small transport current of material, as evidenced in isotope separation by thermal diffusion, the Thompson effect in thermoelectricity, etc. This paper presents a performance assessment of coupled processes

Clinical processes in behavioral couples therapy.

Science.gov (United States)

Fischer, Daniel J; Fink, Brandi C

2014-03-01

Behavioral couples therapy is a broad term for couples therapies that use behavioral techniques based on principles of operant conditioning, such as reinforcement. Behavioral shaping and rehearsal and acceptance are clinical processes found across contemporary behavioral couples therapies. These clinical processes are useful for assessment and case formulation, as well as teaching couples new methods of conflict resolution. Although these clinical processes assist therapists in achieving efficient and effective therapeutic change with distressed couples by rapidly stemming couples' corrosive affective exchanges, they also address the thoughts, emotions, and issues of trust and intimacy that are important aspects of the human experience in the context of a couple. Vignettes are provided to illustrate the clinical processes described. (PsycINFO Database Record (c) 2014 APA, all rights reserved).

Room temperature inductively coupled plasma etching of InAs/InSb in BCl 3/Cl 2/Ar

KAUST Repository

Sun, Jian

2012-10-01

Inductively coupled plasma (ICP) etching of InAs and InSb at room temperature has been investigated using BCl 3/Cl 2/Ar plasma. Specifically, the etch rate and post-etching surface morphology were investigated as functions of the gas composition, ICP power, process pressure, and RF chuck power. An optimized process has been developed, yielding anisotropic etching and very smooth surfaces with roughnesses of 0.25 nm for InAs, and 0.57 nm for InSb, which is comparable with the surface of epi-ready polished wafers. The process provides moderate etching rates of 820 /min for InAs and 2800 /min for InSb, and the micro-masking effect is largely avoided. © 2012 Elsevier B.V. All rights reserved.

The Integrated Plasma Simulator: A Flexible Python Framework for Coupled Multiphysics Simulation

Energy Technology Data Exchange (ETDEWEB)

Foley, Samantha S [ORNL; Elwasif, Wael R [ORNL; Bernholdt, David E [ORNL

2011-11-01

High-fidelity coupled multiphysics simulations are an increasingly important aspect of computational science. In many domains, however, there has been very limited experience with simulations of this sort, therefore research in coupled multiphysics often requires computational frameworks with significant flexibility to respond to the changing directions of the physics and mathematics. This paper presents the Integrated Plasma Simulator (IPS), a framework designed for loosely coupled simulations of fusion plasmas. The IPS provides users with a simple component architecture into which a wide range of existing plasma physics codes can be inserted as components. Simulations can take advantage of multiple levels of parallelism supported in the IPS, and can be controlled by a high-level ``driver'' component, or by other coordination mechanisms, such as an asynchronous event service. We describe the requirements and design of the framework, and how they were implemented in the Python language. We also illustrate the flexibility of the framework by providing examples of different types of simulations that utilize various features of the IPS.

Functional speciation of metal-dissolved organic matter complexes by size exclusion chromatography coupled to inductively coupled plasma mass spectrometry and deconvolution analysis

International Nuclear Information System (INIS)

Laborda, Francisco; Ruiz-Begueria, Sergio; Bolea, Eduardo; Castillo, Juan R.

2009-01-01

High performance size exclusion chromatography coupled to inductively coupled plasma mass spectrometry (HP-SEC-ICP-MS), in combination with deconvolution analysis, has been used to obtain multielemental qualitative and quantitative information about the distributions of metal complexes with different forms of natural dissolved organic matter (DOM). High performance size exclusion chromatography coupled to inductively coupled plasma mass spectrometry chromatograms only provide continuous distributions of metals with respect to molecular masses, due to the high heterogeneity of dissolved organic matter, which consists of humic substances as well as biomolecules and other organic compounds. A functional speciation approach, based on the determination of the metals associated to different groups of homologous compounds, has been followed. Dissolved organic matter groups of homologous compounds are isolated from the aqueous samples under study and their high performance size exclusion chromatography coupled to inductively coupled plasma mass spectrometry elution profiles fitted to model Gaussian peaks, characterized by their respective retention times and peak widths. High performance size exclusion chromatography coupled to inductively coupled plasma mass spectrometry chromatograms of the samples are deconvoluted with respect to these model Gaussian peaks. This methodology has been applied to the characterization of metal-dissolved organic matter complexes in compost leachates. The most significant groups of homologous compounds involved in the complexation of metals in the compost leachates studied have been hydrophobic acids (humic and fulvic acids) and low molecular mass hydrophilic compounds. The environmental significance of these compounds is related to the higher biodegradability of the low molecular mass hydrophilic compounds and the lower mobility of humic acids. In general, the hydrophilic compounds accounted for the complexation of around 50% of the leached

Coupling between chip based isotachophoresis and multi-collector inductively coupled plasma mass spectrometry for separation and measurement of lanthanides

International Nuclear Information System (INIS)

Vio, Laurent; Cretier, Gerard; Rocca, Jean-Louis; Chartier, Frederic; Geertsen, Valerie; Gourgiotis, Alkiviadis; Isnard, Helene; Morin, Pierre

2012-01-01

This paper presents the conception and fabrication of a micro-system for lanthanides separation and its coupling with a multi-collector inductively coupled plasma mass spectrometer for isotope ratio measurements. The lanthanides separation is based on the isotachophoresis technique and the micro-system conception has been adapted in order to fit with glove box limitations in view of future spent nuclear fuels analysis. The micro-device was tested by using a mixture of standard solutions of natural elements and the separation of 13 lanthanides was successfully performed. The micro-device was then coupled to a multi-collector inductively coupled plasma mass spectrometer for the on-line measurements of Nd and Sm isotope ratios. The isotopes of Nd and Sm were acquired online in multi-collection mode after separation of the two elements with an injection amount of 5 ng. Results obtained on the Nd and Sm isotope ratio measurements on transient signals are presented and discussed. (authors)

Agglomeration processes in carbonaceous dusty plasmas, experiments and numerical simulations

International Nuclear Information System (INIS)

Dap, S; Hugon, R; De Poucques, L; Bougdira, J; Lacroix, D; Patisson, F

2010-01-01

This paper deals with carbon dust agglomeration in radio frequency acetylene/argon plasma. Two studies, an experimental and a numerical one, were carried out to model dust formation mechanisms. Firstly, in situ transmission spectroscopy of dust clouds in the visible range was performed in order to observe the main features of the agglomeration process of the produced carbonaceous dust. Secondly, numerical simulation tools dedicated to understanding the achieved experiments were developed. A first model was used for the discretization of the continuous population balance equations that characterize the dust agglomeration process. The second model is based on a Monte Carlo ray-tracing code coupled to a Mie theory calculation of dust absorption and scattering parameters. These two simulation tools were used together in order to numerically predict the light transmissivity through a dusty plasma and make comparisons with experiments.

Styrene and methyl methacrylate copolymer synthesized by RF inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Li, Z; Gillon, X; Diallo, M; Houssiau, L; Pireaux, J-J, E-mail: zhiling.li@fundp.ac.be [University of Namur (FUNDP) Research Centre in Physics of Matter and Radiation (PMR), 61, Rue de Bruxelles, 5000 Namur (Belgium)

2011-01-01

A series of random copolymers of styrene and methyl methacrylate was prepared on a silicon substrate by RF pulsed inductively coupled plasma. The plasma gas phase was investigated by optical emission spectroscopy (OES). The physico-chemical characteristics of the deposited copolymer films were analyzed by several surface techniques: X-ray photoelectron spectroscopy (XPS), Fourier-Transform infrared absorption (FT-IR), Time-of-flight secondary ion mass spectrometry (ToF-SIMS), etc. OES of the plasma and FT-IR spectra of the films are predictive: plasma emitting a higher relative benzyl radical signal results in the deposition of a more aromatic plasma polymer. The functional thin films can be deposited by selection of the co-monomers.

Inductively coupled plasma--atomic emission spectroscopy: an evaluation of the use of nitrogen--argon admixtures as plasma discharge atmospheres

International Nuclear Information System (INIS)

Zalewski, J.C.

1979-01-01

The effects of the use of nitrogen in either the plasma coolant or aerosol carrier gas flows on the physical and spectrochemical properties of the inductively coupled plasma (ICP) were examined. While the plasma operated with nitrogen in the coolant flow exhibited a stability comparable to that of the argon plasma, the use of nitrogen in the aerosol carrier gas flow resulted in a plasma that was less stable. The detection limits obtained for the three plasmas exhibited a similar trend. In addition, the use of nitrogen--argon admixtures in the plasma coolant gas flow yielded an increase in both the net analyte and the background emission intensities when the corresponding argon and nitrogen--argon plasmas were operated under various conditions. Furthermore, the effect of aluminum on the Ca II (393.4 nm) spectral line was reported for the 1000/1 Al/Ca molar ratio. At an observation height of 15 mm, the signal depressions were 4 and 14% for the nitrogen--argon and the argon plasmas, respectively. The above experimental evidence suggested that the operation of the ICP with an Ar--N 2 coolant gas might be hotter than the argon plasma currently in use in this laboratory. The demountable plasma torch designed in collaboration with K. Olson yielded detection limits for 15 elements and 19 spectral lines that were approximately within a factor of two of those obtained with the torch of fused quartz design. The design also appeared to offer a more readily initiated plasma discharge. The experimental evidence presented supports the utilization of nitrogen--argon admixtures in the plasma coolant gas flow as alternate discharge atmospheres for inductively coupled plasma--atomic emission spectroscopy. In contrast, the experimental evidence shows that there is a deterioration in both physical and spectrochemical properties of plasmas operated with a nitrogen aerosol carrier gas

Plasma atomic layer etching using conventional plasma equipment

International Nuclear Information System (INIS)

Agarwal, Ankur; Kushner, Mark J.

2009-01-01

The decrease in feature sizes in microelectronics fabrication will soon require plasma etching processes having atomic layer resolution. The basis of plasma atomic layer etching (PALE) is forming a layer of passivation that allows the underlying substrate material to be etched with lower activation energy than in the absence of the passivation. The subsequent removal of the passivation with carefully tailored activation energy then removes a single layer of the underlying material. If these goals are met, the process is self-limiting. A challenge of PALE is the high cost of specialized equipment and slow processing speed. In this work, results from a computational investigation of PALE will be discussed with the goal of demonstrating the potential of using conventional plasma etching equipment having acceptable processing speeds. Results will be discussed using inductively coupled and magnetically enhanced capacitively coupled plasmas in which nonsinusoidal waveforms are used to regulate ion energies to optimize the passivation and etch steps. This strategy may also enable the use of a single gas mixture, as opposed to changing gas mixtures between steps

Plasma processing of nanomaterials

CERN Document Server

Sankaran, R Mohan

2014-01-01

CRC Press author R. Mohan Sankaran is the winner of the 2011 Peter Mark Memorial Award "… for the development of a tandem plasma synthesis method to grow carbon nanotubes with unprecedented control over the nanotube properties and chirality." -2011 AVS Awards Committee"Readers who want to learn about how nanomaterials are processed, using the most recent methods, will benefit greatly from this book. It contains very recent technical details on plasma processing and synthesis methods used by current researchers developing new nano-based materials, with all the major plasma-based processing techniques used today being thoroughly discussed."-John J. Shea, IEEE Electrical Insulation Magazine, May/June 2013, Vol. 29, No. 3.

On plasma coupling and turbulence effects in low velocity stopping

Energy Technology Data Exchange (ETDEWEB)

Kurilenkov, Yu K [Unified Institute for High Temperatures of Russian Academy of Sciences, 13/19 Izhorskaya Str., 125412 Moscow (Russian Federation); Maynard, G [Laboratoire de Physique des Gaz et des Plasmas, UMR-8578, Bat. 210, Universite Paris XI, F-91405 Orsay (France); Barriga-Carrasco, M D [Laboratoire de Physique des Gaz et des Plasmas, UMR-8578, Bat. 210, Universite Paris XI, F-91405 Orsay (France); Valuev, A A [Unified Institute for High Temperatures of Russian Academy of Sciences, 13/19 Izhorskaya Str., 125412 Moscow (Russian Federation)

2006-04-28

The problem of stopping power (SP) for projectile ions is analysed in terms of the dielectric function and effective collision frequency for moderately dense and strongly coupled plasmas (SCP). We consider several issues regarding the calculation of stopping power for correlated ensembles of particles and oscillators. In particular, effects of group (few particle) modes, transition from positive to negative dispersion and excitation of collective modes up to suprathermal level at plasma targets are addressed. Linear SP of dense suprathermal (nonlinear) plasma targets at different levels of target plasma turbulence is estimated. The force of suprathermal plasma oscillations on the projectile ions is mostly in the nature of increased frictional drag. The results obtained show the possibility of increasing low velocity stopping (up to 'turbulent' values) in comparison with losses in equilibrium dense plasma targets. Experimental conditions to create specific turbulent targets as well as some connection between stopping phenomena and SCP transport properties are discussed briefly.

On plasma coupling and turbulence effects in low velocity stopping

International Nuclear Information System (INIS)

Kurilenkov, Yu K; Maynard, G; Barriga-Carrasco, M D; Valuev, A A

2006-01-01

The problem of stopping power (SP) for projectile ions is analysed in terms of the dielectric function and effective collision frequency for moderately dense and strongly coupled plasmas (SCP). We consider several issues regarding the calculation of stopping power for correlated ensembles of particles and oscillators. In particular, effects of group (few particle) modes, transition from positive to negative dispersion and excitation of collective modes up to suprathermal level at plasma targets are addressed. Linear SP of dense suprathermal (nonlinear) plasma targets at different levels of target plasma turbulence is estimated. The force of suprathermal plasma oscillations on the projectile ions is mostly in the nature of increased frictional drag. The results obtained show the possibility of increasing low velocity stopping (up to 'turbulent' values) in comparison with losses in equilibrium dense plasma targets. Experimental conditions to create specific turbulent targets as well as some connection between stopping phenomena and SCP transport properties are discussed briefly

HAIFA: A modular, fiber-optic coupled, spectroscopic diagnostic for plasmas

International Nuclear Information System (INIS)

Ramsey, A.T.; Turner, S.L.

1987-01-01

HAIFA is a modular, multichannel, fiber optically coupled spectroscopy diagnostic for tokamak plasmas. It operates in the visible, measuring H/sub α/ radiation, the visible continuum from thermal bremsstrahlung, and selected impurity lines. HAIFA is characterized by high modularity and flexibility, good radiation resistance, high noise immunity, and low cost. Details of design, construction, and calibration are given. The analysis of visible bremsstrahlung radiation measurements to deduce the effective ionic charge in a plasma is discussed

Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

International Nuclear Information System (INIS)

Oh, Changhoon; Ryoo, Hoonchul; Lee, Hyungwoo; Hahn, Jae W.; Kim, Se-Yeon; Yi, Hun-Jung

2010-01-01

We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO 2 film on a silicon wafer.

Plasma Etching of superconducting radio frequency cavity by Ar/Cl2 capacitively coupled Plasma

Science.gov (United States)

Upadhyay, Janardan; Popovic, Svetozar; Valente-Feliciano, Anne-Marie; Phillips, Larry; Vuskovic, Lepsha

2016-09-01

We are developing plasma processing technology of superconducting radio frequency (SRF) cavities. The formation of dc self-biases due to surface area asymmetry in this type of plasma and its variation on the pressure, rf power and gas composition was measured. Enhancing the surface area of the inner electrode to reduce the asymmetry was studied by changing the contour of the inner electrode. The optimized contour of the electrode based on these measurements was chosen for SRF cavity processing. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used, which previously mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. Plasma processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.

Inductively coupled plasma mass spectrometry (ICP-MS)

International Nuclear Information System (INIS)

Shimamura, Tadashi

1997-01-01

The period of investigation for the previous general remarks on the progress of ICP-MS was from January, 1991 to September, 1993. In the investigation of this time, for the object of the Chemical Abstracts from January, 1994 to September, 1996, retrieval was carried out by using the STN International. As the key words, ICP-MS, Inductively Coupled Plasma Mass Spectrometry or Inductively Coupled Plasma Mass Spectrometer was used. The number of hit was 373 in 1994, 462 in 1995, and 356 as of September, 1996, 1191 in total. The cumulative number of the papers from 1980 to 1996 is shown. It is known how rapidly the ICP-MS has pervaded as the means of analysis. In order to cope with the enormous number of papers, this time, it was decided to do the review by limiting to the papers which were published in the main journals deeply related to analytical chemistry. As to the tendency in the last three years, it is summarized as how to overcome the spectrum interference and matrix effect in the ICP-MS and the trend of using the ICP-MS as the high sensitivity detector for separation techniques. The technical basic research of the ICP-MS on spectrum interference, sample introduction method and others and the analysis of living body samples are reported. (K.I.)

Energy exchange in strongly coupled plasmas with electron drift

International Nuclear Information System (INIS)

Akbari-Moghanjoughi, M.; Ghorbanalilu, M.

2015-01-01

In this paper, the generalized viscoelastic collisional quantum hydrodynamic model is employed in order to investigate the linear dielectric response of a quantum plasma in the presence of strong electron-beam plasma interactions. The generalized Chandrasekhar's relativistic degeneracy pressure together with the electron-exchange and Coulomb interaction effects are taken into account in order to extend current research to a wide range of plasma number density relevant to big planetary cores and astrophysical compact objects. The previously calculated shear viscosity and the electron-ion collision frequencies are used for strongly coupled ion fluid. The effect of the electron-beam velocity on complex linear dielectric function is found to be profound. This effect is clearly interpreted in terms of the wave-particle interactions and their energy-exchange according to the sign of the imaginary dielectric function, which is closely related to the wave attenuation coefficient in plasmas. Such kinetic effect is also shown to be in close connection with the stopping power of a charged-particle beam in a quantum plasma. The effect of many independent plasma parameters, such as the ion charge-state, electron beam-velocity, and relativistic degeneracy, is shown to be significant on the growing/damping of plasma instability or energy loss/gain of the electron-beam

Effect of vapor plasma on the coupling of laser radiation with aluminum targets

Energy Technology Data Exchange (ETDEWEB)

Shui, V H; Kivel, B; Weyl, G M

1978-12-01

The effect of vapor plasma on thermal and impulse coupling of laser radiation with aluminum targets is studied to understand and explain experimental data showing anomalously high coupling to 10.6-micron laser radiation. Heating of vapor by inverse bremsstrahlung absorption of laser radiation, subsequent reradiation in the uv and deep uv by ionized species, and vapor layer growth are modeled. A computer code has been developed to solve the governing equations. Major conclusions include the following: (1) vapor plasma radiative transport can be an important mechanism for laser/target coupling, (2) aluminum vapor (density times thickness) approximately equal to 10 to the 17th power/sq cm (corresponding to about 0.01 micron of target material) can result in thermal coupling coefficients of 20% or more, and (3) too much vapor reduces the net flux at the target.

Non-thermal hydrogen plasma processing effectively increases the antibacterial activity of graphene oxide

Science.gov (United States)

Ke, Zhigang; Ma, Yulong; Zhu, Zhongjie; Zhao, Hongwei; Wang, Qi; Huang, Qing

2018-01-01

Graphene-based materials (GMs) are promising antibacterial agents which provide an alternative route to treat pathogenic bacteria with resistance to conventional antibiotics. To further improve their antibacterial activity, many methods have been developed to functionalize the GMs with chemicals. However, the application of additional chemicals may pose potential risks to the environment and human being. Herein, a radio-frequency-driven inductively coupled non-thermal hydrogen plasma was used to treat and reduce graphene oxide (GO) without using any other chemicals, and we found that the plasma-reduced GO (prGO) is with significantly higher bactericidal activity against Escherichia coli. The mechanism of the increased antibacterial activity of prGO is due to that plasma processing breaks down the GO sheets into smaller layers with more rough surface defects, which can thus induce more destructive membrane damages to the bacteria. This work sets another good example, showing that plasma processing is a green and low-cost alternative for GM modification for biomedical applications.

Low-pressure water-cooled inductively coupled plasma torch

Science.gov (United States)

Seliskar, Carl J.; Warner, David K.

1988-12-27

An inductively coupled plasma torch is provided which comprises an inner tube, including a sample injection port to which the sample to be tested is supplied and comprising an enlarged central portion in which the plasma flame is confined; an outer tube surrounding the inner tube and containing water therein for cooling the inner tube, the outer tube including a water inlet port to which water is supplied and a water outlet port spaced from the water inlet port and from which water is removed after flowing through the outer tube; and an r.f. induction coil for inducing the plasma in the gas passing into the tube through the sample injection port. The sample injection port comprises a capillary tube including a reduced diameter orifice, projecting into the lower end of the inner tube. The water inlet is located at the lower end of the outer tube and the r.f. heating coil is disposed around the outer tube above and adjacent to the water inlet.

A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas

International Nuclear Information System (INIS)

Munafò, A.; Alfuhaid, S. A.; Panesi, M.; Cambier, J.-L.

2015-01-01

The objective of the present work is the development of a tightly coupled magneto-hydrodynamic model for inductively coupled radio-frequency plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State approach. A multi-temperature formulation is used to account for thermal non-equilibrium between translation of heavy-particles and vibration of molecules. Excited electronic states of atoms are instead treated as separate pseudo-species, allowing for non-Boltzmann distributions of their populations. Free-electrons are assumed Maxwellian at their own temperature. The governing equations for the electro-magnetic field and the gas properties (e.g., chemical composition and temperatures) are written as a coupled system of time-dependent conservation laws. Steady-state solutions are obtained by means of an implicit Finite Volume method. The results obtained in both LTE and NLTE conditions over a broad spectrum of operating conditions demonstrate the robustness of the proposed coupled numerical method. The analysis of chemical composition and temperature distributions along the torch radius shows that: (i) the use of the LTE assumption may lead to an inaccurate prediction of the thermo-chemical state of the gas, and (ii) non-equilibrium phenomena play a significant role close the walls, due to the combined effects of Ohmic heating and macroscopic gradients

Effect of low-damage inductively coupled plasma on shallow nitrogen-vacancy centers in diamond

Energy Technology Data Exchange (ETDEWEB)

Fávaro de Oliveira, Felipe; Momenzadeh, S. Ali; Wang, Ya; Denisenko, Andrej, E-mail: a.denisenko@physik.uni-stuttgart.de [3. Institute of Physics, Research Center SCoPE and IQST, University of Stuttgart, 70569 Stuttgart (Germany); Konuma, Mitsuharu [Max Planck Institute for Solid State Research, 70569 Stuttgart (Germany); Markham, Matthew; Edmonds, Andrew M. [Element Six Innovation, Harwell Oxford, Didcot, Oxfordshire OX11 0QR (United Kingdom); Wrachtrup, Jörg [3. Institute of Physics, Research Center SCoPE and IQST, University of Stuttgart, 70569 Stuttgart (Germany); Max Planck Institute for Solid State Research, 70569 Stuttgart (Germany)

2015-08-17

Near-surface nitrogen-vacancy (NV) centers in diamond have been successfully employed as atomic-sized magnetic field sensors for external spins over the last years. A key challenge is still to develop a method to bring NV centers at nanometer proximity to the diamond surface while preserving their optical and spin properties. To that aim we present a method of controlled diamond etching with nanometric precision using an oxygen inductively coupled plasma process. Importantly, no traces of plasma-induced damages to the etched surface could be detected by X-ray photoelectron spectroscopy and confocal photoluminescence microscopy techniques. In addition, by profiling the depth of NV centers created by 5.0 keV of nitrogen implantation energy, no plasma-induced quenching in their fluorescence could be observed. Moreover, the developed etching process allowed even the channeling tail in their depth distribution to be resolved. Furthermore, treating a {sup 12}C isotopically purified diamond revealed a threefold increase in T{sub 2} times for NV centers with <4 nm of depth (measured by nuclear magnetic resonance signal from protons at the diamond surface) in comparison to the initial oxygen-terminated surface.

New system for vacuum deposition of refractory materials using an atmospheric-pressure inductively coupled plasma

International Nuclear Information System (INIS)

Merkle, B.D.; Kniseley, R.N.; Schmidt, F.A.

1987-01-01

We have successfully developed a technique utilizing an atmospheric-pressure inductively coupled plasma combined with a low-pressure deposition chamber for deposition of thin films. The equipment and method of operation are discussed. Refractory powders (Nb and Y 2 O 3 ) were injected into the plasma and deposited as Nb and substoichiometric yttrium oxide, YO/sub 1.49/, onto Fe and Cu substrates. The substoichiometric yttrium oxide deposit adhered well to the Fe and Cu substrates, while the Nb deposit adhered well to the Fe only. The Nb deposit on the Cu substrate flaked and peeled probably because of stresses induced from the thermal expansion mismatch between the Nb and Cu. Further studies will be undertaken to better understand the processes occurring in this type of plasma-coating system in order to optimize the instrumental parameters for particular coating applications

Coupled two-dimensional edge-plasma and neutral gas modelling of the DIII-D scrape-off-layer

International Nuclear Information System (INIS)

Maingi, R.; Gilligan, J.; Hankins, O.; Rensink, M.; Owen, L.; Klepper, C.; Mioduszewski, P.

1992-01-01

This paper reports that in order to do consistent scrape-off-layer plasma and neutral transport calculations, the 2-D fluid code, B2 has been externally coupled to the neutral transport code, DEGAS, for Dlll-D. The coupling procedure is similar to recent simulations done for TFTR, Tore Supra, and ClT. An averaged source approach is utilized to allow convergence between the two codes. Initial comparison of plasma quantities between the coupled code set and the B2 code alone shows that a colder, denser plasma may exist at the divertor targets than predicted by the B2 code with its internal recycling model

Plasma processing of soft materials for development of flexible devices

International Nuclear Information System (INIS)

Setsuhara, Yuichi; Cho, Ken; Takenaka, Kosuke; Shiratani, Masaharu; Sekine, Makoto; Hori, Masaru

2011-01-01

Plasma-polymer interactions have been studied as a basis for development of next-generation processing of flexible devices with soft materials by means of low-damage plasma technologies (soft materials processing technologies). In the present article, interactions between argon plasmas and polyethylene terephthalate (PET) films have been examined for investigations of physical damages induced by plasma exposures to the organic material via chemical bonding-structure analyses using hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS). The PET film has been selected as a test material for investigations in the present study not merely because of its specific applications, such as a substrate material, but because PET is one of the well defined organic materials containing major components in a variety of functional soft materials; C-C main chain, CH bond, oxygen functionalities (O=C-O bond and C-O bond) and phenyl group. Especially, variations of the phenyl group due to argon plasma exposures have been investigated in the present article in order to examine plasma interactions with π-conjugated system, which is in charge of electronic functions in many of the π-conjugated electronic organic materials to be utilized as functional layer for advanced flexible device formations. The PET films have been exposed to argon plasmas sustained via inductive coupling of RF power with low-inductance antenna modules. The HXPES analyses exhibited that the degradations of the oxygen functionalities and the phenyl group in the deeper regions up to 50 nm from the surface of the samples were insignificant indicating that the bond scission and/or the degradations of the chemical bonding structures due to photoirradiation from the plasma and/or surface heating via plasma exposure were relatively insignificant as compared with damages in the vicinity of the surface layers.

Kinetic and radiation processes in cluster plasmas

International Nuclear Information System (INIS)

Smirnov, B.M.

1996-01-01

The analysis of processes is made for a cluster plasma which is a xenon arc plasma of a high pressure with an admixture of tungsten cluster ions. Because cluster ions emit radiation, this system is a light source which parameters are determined by various processes such as heat release and transport of charged particles in the plasma, radiative processes involving clusters, processes of cluster evaporation and attachment of atoms to it that leads to an equilibrium between clusters and vapor of their atoms, processes of cluster generation, processes of the ionization equilibrium between cluster ions and plasma electrons, transport of cluster ions in the discharge plasma in all directions. These processes govern by properties of a specific cluster plasma under consideration. (author)

Deposition of silicon oxynitride at room temperature by Inductively Coupled Plasma-CVD

Energy Technology Data Exchange (ETDEWEB)

Zambom, Luis da Silva [MPCE-Faculdade de Tecnologia de Sao Paulo - CEETEPS, Pca Coronel Fernando Prestes, 30, Sao Paulo - CEP 01124-060 (Brazil)]. E-mail: zambom@lsi.usp.br; Verdonck, Patrick [PSI-LSI-Escola Politecnica da Universidade de Sao Paulo (Brazil)]. E-mail: patrick@lsi.usp.br

2006-10-25

Oxynitride thin films are used in important optical applications and as gate dielectric for MOS devices. Their traditional deposition processes have the drawbacks that high temperatures are needed, high mechanical stresses are induced and the deposition rate is low. Plasma assisted processes may alleviate these problems. In this study, oxynitride films were deposited at room temperature through the chemical reaction of silane, nitrogen and nitrous oxide (N{sub 2}O), in a conventional LPCVD furnace, which was modified into a high density Inductively Coupled Plasma (ICP) reactor. Deposition rates increased with applied coil power and were never lower than 10 nm/min, quite high for room temperature depositions. The films' refractive indexes and FTIR spectra indicate that for processes with low N{sub 2}O gas concentrations, when mixed together with N{sub 2} and SiH{sub 4}, nitrogen was incorporated in the film. This incorporation increased the resistivity, which was up to 70 G{omega} cm, increased the refractive index, from approximately 1.47 to approximately 1.50, and decreased the dielectric constant of these films, which varied in the 4-14 range. These characteristics are adequate for electric applications e.g. for TFT fabrication on glass or polymers which can not stand high temperature steps.

Ratio of bulk to shear viscosity in a quasigluon plasma: from weak to strong coupling

CERN Document Server

Bluhm, M; Redlich, K

2012-01-01

The ratio of bulk to shear viscosity is expected to exhibit a different behaviour in weakly and in strongly coupled systems. This can be expressed by the dependence of the ratio on the squared sound velocity. In the high temperature QCD plasma at small running coupling, the viscosity ratio is uniquely determined by a quadratic dependence on the conformality measure, whereas in certain strongly coupled and nearly conformal theories this dependence is linear. Employing an effective kinetic theory of quasiparticle excitations with medium-modified dispersion relation, we analyze the ratio of bulk to shear viscosity of the gluon plasma. We show that in this approach the viscosity ratio comprises both dependencies found by means of weak coupling perturbative and strong coupling holographic techniques.

Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study

International Nuclear Information System (INIS)

Zhao, Shu-Xia; Zhang, Yu-Ru; Gao, Fei; Wang, You-Nian; Bogaerts, Annemie

2015-01-01

A hybrid model is used to investigate the fragmentation of C 4 F 8 inductive discharges. Indeed, the resulting reactive species are crucial for the optimization of the Si-based etching process, since they determine the mechanisms of fluorination, polymerization, and sputtering. In this paper, we present the dissociation degree, the density ratio of F vs. C x F y (i.e., fluorocarbon (fc) neutrals), the neutral vs. positive ion density ratio, details on the neutral and ion components, and fractions of various fc neutrals (or ions) in the total fc neutral (or ion) density in a C 4 F 8 inductively coupled plasma source, as well as the effect of pressure and power on these results. To analyze the fragmentation behavior, the electron density and temperature and electron energy probability function (EEPF) are investigated. Moreover, the main electron-impact generation sources for all considered neutrals and ions are determined from the complicated C 4 F 8 reaction set used in the model. The C 4 F 8 plasma fragmentation is explained, taking into account many factors, such as the EEPF characteristics, the dominance of primary and secondary processes, and the thresholds of dissociation and ionization. The simulation results are compared with experiments from literature, and reasonable agreement is obtained. Some discrepancies are observed, which can probably be attributed to the simplified polymer surface kinetics assumed in the model

Dry etching of ITO by magnetic pole enhanced inductively coupled plasma for display and biosensing devices

Energy Technology Data Exchange (ETDEWEB)

Meziani, T. [European Commission, Joint Research Centre, Institute for Health and Consumer Protection, 21020 Ispra (Vatican City State, Holy See,) (Italy)]. E-mail: tarik.meziani@jrc.it; Colpo, P. [European Commission, Joint Research Centre, Institute for Health and Consumer Protection, 21020 Ispra (Va) (Italy)]. E-mail: pascal.colpo@jrc.it; Lambertini, V. [Centro Ricerche Fiat, Strada Torino 50, 10043 Orbassano (TO) (Italy); Ceccone, G. [European Commission, Joint Research Centre, Institute for Health and Consumer Protection, 21020 Ispra (Va) (Italy); Rossi, F. [European Commission, Joint Research Centre, Institute for Health and Consumer Protection, 21020 Ispra (Va) (Italy)

2006-03-15

The dry etching of indium tin oxide (ITO) layers deposited on glass substrates was investigated in a high density inductively coupled plasma (ICP) source. This innovative low pressure plasma source uses a magnetic core in order to concentrate the electromagnetic energy on the plasma and thus provides for higher plasma density and better uniformity. Different gas mixtures were tested containing mainly hydrogen, argon and methane. In Ar/H{sub 2} mixtures and at constant bias voltage (-100 V), the etch rate shows a linear dependence with input power varying the same way as the ion density, which confirms the hypothesis that the etching process is mainly physical. In CH{sub 4}/H{sub 2} mixtures, the etch rate goes through a maximum for 10% CH{sub 4} indicating a participation of the radicals to the etching process. However, the etch rate remains quite low with this type of gas mixture (around 10 nm/min) because the etching mechanism appears to be competing with a deposition process. With CH{sub 4}/Ar mixtures, a similar feature appeared but the etch rate was much higher, reaching 130 nm/min at 10% of CH{sub 4} in Ar. The increase in etch rate with the addition of a small quantity of methane indicates that the physical etching process is enhanced by a chemical mechanism. The etching process was monitored by optical emission spectroscopy that appeared to be a valuable tool for endpoint detection.

Electron capture and excitation processes in H+-H collisions in dense quantum plasmas

Science.gov (United States)

Jakimovski, D.; Markovska, N.; Janev, R. K.

2016-10-01

Electron capture and excitation processes in proton-hydrogen atom collisions taking place in dense quantum plasmas are studied by employing the two-centre atomic orbital close-coupling (TC-AOCC) method. The Debye-Hückel cosine (DHC) potential is used to describe the plasma screening effects on the Coulomb interaction between charged particles. The properties of a hydrogen atom with DHC potential are investigated as a function of the screening strength of the potential. It is found that the decrease in binding energy of nl levels with increasing screening strength is considerably faster than in the case of the Debye-Hückel (DH) screening potential, appropriate for description of charged particle interactions in weakly coupled classical plasmas. This results in a reduction in the number of bound states in the DHC potential with respect to that in the DH potential for the same plasma screening strength, and is reflected in the dynamics of excitation and electron capture processes for the two screened potentials. The TC-AOCC cross sections for total and state-selective electron capture and excitation cross sections with the DHC potential are calculated for a number of representative screening strengths in the 1-300 keV energy range and compared with those for the DH and pure Coulomb potential. The total capture cross sections for a selected number of screening strengths are compared with the available results from classical trajectory Monte Carlo calculations.

Study of plasma parameters influencing fractionation in laser ablation-inductively coupled plasma-mass spectrometry

Science.gov (United States)

Gäckle, M.; Merten, D.

2010-12-01

Methods permitting to test the influence of the matrix as well as of its local and temporal distribution on the plasma conditions in laser ablation-inductively coupled plasma mass spectrometry (LA-ICP-MS) are developed. For this purpose, the MS interface is used as plasma probe allowing to investigate the average plasma condition within the ICP zone observed in terms of temporal and spatial distribution of the matrix. Inserted matrix particles, particularly when being atomized and ionized, can cause considerable changes in both electron density and plasma temperature thus influencing the ionization equilibrium of the individual analytes. In this context, the plasma probe covers a region of the plasma for which no local thermodynamic equilibrium can be assumed. The differences in temperature, identified within the region of the plasma observed, amounted up to 3000 K. While in the central region conditions were detected that would not allow efficient atomization and ionization of the matrix, these conditions improve considerably towards the margin of the area observed. Depending on the nature as well as on the temporally and locally variable density of the matrix, this can lead to varying intensity ratios of the analytes and explain fractionation effects. By means of a derived equation it is shown that the deviation of the intensity ratio from the concentration ratio turns out to be more serious the higher the difference of the ionization potential of the analytes observed, the lower the plasma temperature and the higher the matrix concentration within the area observed.

Effect of low-frequency power on dual-frequency capacitively coupled plasmas

International Nuclear Information System (INIS)

Yuan, Q H; Xin, Y; Huang, X J; Sun, K; Ning, Z Y; Yin, G Q

2008-01-01

In low-pressure dual-frequency capacitively coupled plasmas driven with 60/13.56 MHz, the effect of low-frequency power on the plasma characteristics was investigated using a compensated Langmuir electrostatic probe. At lower pressures (about 10 mTorr), it was possible to control the plasma density and the ion bombardment energy independently. As the pressure increased, this independent control could not be achieved. As the low-frequency power increased for the fixed high-frequency power, the electron energy probability function (EEPF) changed from Druyvesteyn-like to Maxwellian-like at pressures of 50 mTorr and higher, along with a drop in electron temperature. The plasma parameters were calculated and compared with simulation results.

Collaborative project: research on strongly coupled plasmas. Final technical report for period July 15, 1998--July 14, 2002

International Nuclear Information System (INIS)

Golden, Kenneth I.

2002-01-01

The main research accomplishments/findings of the project were the following: (1) Publication of an in-depth review article in Physics of Plasmas on the quasilocalized charge approximation (QLCA) in strongly coupled plasma physics and its application to a variety of Coulomb systems: the model one-component plasma in three and two dimensions, binary ionic mixtures, charged particle bilayers, and laboratory dusty plasmas. (2) In the strongly coupled Coulomb liquid phase, the physical basis of the QLCA, namely, the caging of particles trapped in slowly fluctuating local potential minima, is supported by molecular dynamics simulation of the classical three-dimensional one-component plasma. (3) The QLCA theory, when applied to the analysis of the collective modes in strongly coupled charged particle bilayers, predicts the existence of a remarkable long-wavelength energy gap in the out-of-phase excitation spectrum. More recent theoretical calculations based on the three principal frequency-moment sum rules reveal that the gap persists for arbitrary coupling strengths and over the entire classical to quantum domain all the way down to zero temperature. The existence of the energy gap has now been confirmed in a molecular dynamics simulation of the charged particle bilayer. (4) New compressibility and third-frequency-moment sum rules for multilayer plasmas were formulated and applied to the analysis of the dynamical structure function of charged particle bilayers and superlattices. (5) An equivalent of the Debye-Huckel weak coupling equilibrium theory for classical charged particle bilayer and superlattice plasmas was formulated. (6) The quadratic fluctuation-dissipation theorem (QFDT) for layered classical plasmas was formulated. (7) The QFDT was applied to a powerful kinetic theory-based description of the density-density response function and long-wavelength plasma mode behavior in strongly coupled two-dimensional Coulomb fluids in the weakly degenerate quantum domain

Physical processes in hot cosmic plasmas

International Nuclear Information System (INIS)

Fabian, A.G.; Giovannelli, F.

1990-01-01

The interpretation of many high energy astrophysical phenomena relies on a detailed knowledge of radiation and transport processes in hot plasmas. The understanding of these plasma properties is one of the aims of terrestrial plasma physics. While the microscopic properties of astrophysical plasmas can hardly be determined experimentally, laboratory plasmas are more easily accessible to experimental techniques, but transient phenomena and the interaction of the plasma with boundaries often make the interpretation of measurements cumbersome. This book contains the talks given at the NATO Advanced Research Workshop on astro- and plasma-physics in Vulcano, Sicily, May 29-June 2, 1989. The book focuses on three main areas: radiation transport processes in hot (astrophysical and laboratory) plasmas; magnetic fields; their generation, reconnection and their effects on plasma transport properties; relativistic and ultra-high density plasmas

Gluon Bremsstrahlung in Weakly-Coupled Plasmas

International Nuclear Information System (INIS)

Arnold, Peter

2009-01-01

I report on some theoretical progress concerning the calculation of gluon bremsstrahlung for very high energy particles crossing a weakly-coupled quark-gluon plasma. (i) I advertise that two of the several formalisms used to study this problem, the BDMPS-Zakharov formalism and the AMY formalism (the latter used only for infinite, uniform media), can be made equivalent when appropriately formulated. (ii) A standard technique to simplify calculations is to expand in inverse powers of logarithms ln(E/T). I give an example where such expansions are found to work well for ω/T≥10 where ω is the bremsstrahlung gluon energy. (iii) Finally, I report on perturbative calculations of q.

Radionuclide determination in environmental samples by inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Lariviere, Dominic; Taylor, Vivien F.; Evans, R. Douglas; Cornett, R. Jack

2006-01-01

The determination of naturally occurring and anthropogenic radionuclides in the environment by inductively coupled plasma mass spectrometry has gained recognition over the last fifteen years, relative to radiometric techniques, as the result of improvement in instrumental performance, sample introduction equipment, and sample preparation. With the increase in instrumental sensitivity, it is now possible to measure ultratrace levels (fg range) of many radioisotopes, including those with half-lives between 1 and 1000 years, without requiring very complex sample pre-concentration schemes. However, the identification and quantification of radioisotopes in environmental matrices is still hampered by a variety of analytical issues such as spectral (both atomic and molecular ions) and non-spectral (matrix effect) interferences and instrumental limitations (e.g., abundance sensitivity). The scope of this review is to highlight recent analytical progress and issues associated with the determination of radionuclides by inductively coupled plasma mass spectrometry. The impact of interferences, instrumental limitations (e.g., degree of ionization, abundance sensitivity, detection limits) and low sample-to-plasma transfer efficiency on the measurement of radionuclides by inductively coupled plasma mass spectrometry will be described. Solutions that overcome these issues will be discussed, highlighting their pros and cons and assessing their impact on the measurement of environmental radioactivity. Among the solutions proposed, mass and chemical resolution through the use of sector-field instruments and chemical reactions/collisions in a pressurized cell, respectively, will be described. Other methods, such as unique sample introduction equipment (e.g., laser ablation, electrothermal vaporisation, high efficiency nebulization) and instrumental modifications/optimizations (e.g., instrumental vacuum, radiofrequency power, guard electrode) that improve sensitivity and performance

Inductively Coupled Plasma-Induced Etch Damage of GaN p-n Junctions

International Nuclear Information System (INIS)

SHUL, RANDY J.; ZHANG, LEI; BACA, ALBERT G.; WILLISON, CHRISTI LEE; HAN, JUNG; PEARTON, S.J.; REN, F.

1999-01-01

Plasma-induced etch damage can degrade the electrical and optical performance of III-V nitride electronic and photonic devices. We have investigated the etch-induced damage of an Inductively Coupled Plasma (ICP) etch system on the electrical performance of mesa-isolated GaN pn-junction diodes. GaN p-i-n mesa diodes were formed by Cl 2 /BCl 3 /Ar ICP etching under different plasma conditions. The reverse leakage current in the mesa diodes showed a strong relationship to chamber pressure, ion energy, and plasma flux. Plasma induced damage was minimized at moderate flux conditions (≤ 500 W), pressures ≥2 mTorr, and at ion energies below approximately -275 V

A fully-implicit Particle-In-Cell Monte Carlo Collision code for the simulation of inductively coupled plasmas

Science.gov (United States)

Mattei, S.; Nishida, K.; Onai, M.; Lettry, J.; Tran, M. Q.; Hatayama, A.

2017-12-01

We present a fully-implicit electromagnetic Particle-In-Cell Monte Carlo collision code, called NINJA, written for the simulation of inductively coupled plasmas. NINJA employs a kinetic enslaved Jacobian-Free Newton Krylov method to solve self-consistently the interaction between the electromagnetic field generated by the radio-frequency coil and the plasma response. The simulated plasma includes a kinetic description of charged and neutral species as well as the collision processes between them. The algorithm allows simulations with cell sizes much larger than the Debye length and time steps in excess of the Courant-Friedrichs-Lewy condition whilst preserving the conservation of the total energy. The code is applied to the simulation of the plasma discharge of the Linac4 H- ion source at CERN. Simulation results of plasma density, temperature and EEDF are discussed and compared with optical emission spectroscopy measurements. A systematic study of the energy conservation as a function of the numerical parameters is presented.

Strongly coupled Coulomb systems with positive dust grains: thermal and UV-induced plasmas

International Nuclear Information System (INIS)

Samarian, A.A.

2000-01-01

Full text: A plasma containing macroscopic dust particles or grains (often referred to as a dusty or colloidal or complex plasma) has the feature that grains may be charged by electron or ion flux or by photo- or thermoelectron emission. Electron emission from a grain surface produces a positive charge; capture of electrons produces the reverse effect making the dust grains negatively charged. Most dusty plasma research is concerned with the ordered dust structures (so-called 'plasma crystal') in glow discharges. The dust grains in these experiments were found to carry a negative charge due to the higher mobility of electrons as compared to ions in the discharge plasma. In recent years, in parallel with the study of the properties of plasma crystals under discharge conditions, attempts to obtain a structure from positively charged dust grains have been made, and structure formation processes for various charging mechanisms, particularly thermoelectron emission and photoemission, have been investigated. In this paper we review the essential features of strongly coupled plasmas with positive dust grains. An ordered structure of CeO 2 grains has been experimentally observed in a combustion products jet. The grains were charged positively and suspended in the plasma flow. Their charge is about 10 3 a and the calculated value of a Coulomb coupling parameter Γ is >10, corresponding to a plasma liquid. The ordered structures of Al 2 O 3 dust grains in propellant combustion products plasma have been observed for the first time. These structures were found in the sheath boundary of condensation region. The obtained data let us estimate the value of parameter Γ =3-40, corresponding to the plasma liquid state. The possibility is studied of the formation of ordered dust grain structures in thermal plasma. The range of the required values of the coupling parameter Γ is calculated using the results of diagnostic measurements carried out in thermal plasma with grains of

Transfer coefficients in ultracold strongly coupled plasma

Science.gov (United States)

Bobrov, A. A.; Vorob'ev, V. S.; Zelener, B. V.

2018-03-01

We use both analytical and molecular dynamic methods for electron transfer coefficients in an ultracold plasma when its temperature is small and the coupling parameter characterizing the interaction of electrons and ions exceeds unity. For these conditions, we use the approach of nearest neighbor to determine the average electron (ion) diffusion coefficient and to calculate other electron transfer coefficients (viscosity and electrical and thermal conductivities). Molecular dynamics simulations produce electronic and ionic diffusion coefficients, confirming the reliability of these results. The results compare favorably with experimental and numerical data from earlier studies.

High-current electron beam coupling to hybrid waveguide and plasma modes in a dielectric Cherenkov maser with a plasma layer

International Nuclear Information System (INIS)

Shlapakovski, Anatoli S.

2002-01-01

The linear theory of a dielectric Cherenkov maser with a plasma layer has been developed. The dispersion relation has been derived for the model of infinitely thin, fully magnetized, monoenergetic hollow electron beam, in the axisymmetric case. The results of the numerical solution of the dispersion relation and the analysis of the beam coupling to hybrid waves, both hybrid waveguide and hybrid plasma modes, are presented. For the hybrid waveguide mode, spatial growth rate dependences on frequency at different plasma densities demonstrate improvement in gain for moderate densities, but strong shifting the amplification band and narrowing the bandwidth. For the hybrid plasma mode, the case of mildly relativistic, 200-250 keV beams is of interest, so that the wave phase velocity is just slightly greater than the speed of light in a dielectric medium. It has been shown that depending on beam and plasma parameters, the hybrid plasma mode can be separated from the hybrid waveguide mode, or be coupled to it through the beam resulting in strong gain increase, or exhibit a flat gain vs frequency dependence over a very broad band. The parameters, at which the -3 dB bandwidth calculated for 30 dB peak gain exceeds an octave, have been found

Matrix effects in inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Chen, Xiaoshan.

1995-01-01

The inductively coupled plasma is an electrodeless discharge in a gas (usually Ar) at atmospheric pressure. Radio frequency energy generated by a RF power source is inductively coupled to the plasma gas through a water cooled load coil. In ICP-MS the open-quotes Fasselclose quotes TAX quartz torch commonly used in emission is mounted horizontally. The sample aerosol is introduced into the central flow, where the gas kinetic temperature is about 5000 K. The aerosol is vaporized, atomized, excited and ionized in the plasma, and the ions are subsequently extracted through two metal apertures (sampler and skimmer) into the mass spectrometer. In ICP-MS, the matrix effects, or non-spectroscopic interferences, can be defined as the type of interferences caused by dissolved concomitant salt ions in the solution. Matrix effects can be divided into two categories: (1) signal drift due to the deposition of solids on the sampling apertures; and/or (2) signal suppression or enhancement by the presence of the dissolved salts. The first category is now reasonably understood. The dissolved salts, especially refractory oxides, tend to deposit on the cool tip of the sampling cone. The clogging of the orifices reduces the ion flow into the ICP-MS, lowers the pressure in the first stage of ICP-MS, and enhances the level of metal oxide ions. Because the extent of the clogging increases with the time, the signal drifts down. Even at the very early stage of the development of ICP-MS, matrix effects had been observed. Houk et al. found out that the ICP-MS was not tolerant to solutions containing significant amounts of dissolved solids

Discontinuity of mode transition and hysteresis in hydrogen inductively coupled plasma via a fluid model

International Nuclear Information System (INIS)

Xu Hui-Jing; Shu-Xia Zhao; Gao Fei; Zhang Yu-Ru; Li Xue-Chun; Wang You-Nian

2015-01-01

A new type of two-dimensional self-consistent fluid model that couples an equivalent circuit module is used to investigate the mode transition characteristics and hysteresis in hydrogen inductively coupled plasmas at different pressures, by varying the series capacitance of the matching box. The variations of the electron density, temperature, and the circuit electrical properties are presented. As cycling the matching capacitance, at high pressure both the discontinuity and hysteresis appear for the plasma parameters and the transferred impedances of both the inductive and capacitive discharge components, while at low pressure only the discontinuity is seen. The simulations predict that the sheath plays a determinative role on the presence of discontinuity and hysteresis at high pressure, by influencing the inductive coupling efficiency of applied power. Moreover, the values of the plasma transferred impedances at different pressures are compared, and the larger plasma inductance at low pressure due to less collision frequency, as analyzed, is the reason why the hysteresis is not seen at low pressure, even with a wider sheath. Besides, the behaviors of the coil voltage and current parameters during the mode transitions are investigated. They both increase (decrease) at the E to H (H to E) mode transition, indicating an improved (worsened) inductive power coupling efficiency. (paper)

DIII-D Edge Plasma, Disruptions, and Radiative Processes. Final Report

Energy Technology Data Exchange (ETDEWEB)

Boedo, J. A.; Luckhardt, S.C.; Moyer, R. A.

2001-01-01

The scientific goal of the UCSD-DIII-D Collaboration during this period was to understand the coupling of the core plasma to the plasma-facing components through the plasma boundary (edge and scrape-off layer). To achieve this goal, UCSD scientists studied the transport of particles, momentum, energy, and radiation from the plasma core to the plasma-facing components under normal (e.g., L-mode, H-mode, and ELMs), and off-normal (e.g., disruptions) operating conditions.

DIII-D Edge Plasma, Disruptions, and Radiative Processes. Final Report

International Nuclear Information System (INIS)

Boedo, J. A.; Luckhardt, S.C.; Moyer, R. A.

2001-01-01

The scientific goal of the UCSD-DIII-D Collaboration during this period was to understand the coupling of the core plasma to the plasma-facing components through the plasma boundary (edge and scrape-off layer). To achieve this goal, UCSD scientists studied the transport of particles, momentum, energy, and radiation from the plasma core to the plasma-facing components under normal (e.g., L-mode, H-mode, and ELMs), and off-normal (e.g., disruptions) operating conditions

Plasma technologies: applications to waste processing

International Nuclear Information System (INIS)

Fauchais, P.

2007-01-01

Since the 1990's, plasma technologies have found applications in the processing of toxic wastes of military and industrial origin, like the treatment of contaminated solids and low level radioactive wastes, the decontamination of soils etc.. Since the years 2000, this development is becoming exponential, in particular for the processing of municipal wastes and the recovery of their synthesis gas. The advantage of thermal plasmas with respect to conventional combustion techniques are: a high temperature (more than 6000 K), a pyrolysis capability (CO formation instead of CO 2 ), about 90% of available energy above 1500 K (with respect to 23% with flames), a greater energy density, lower gas flow rates, and plasma start-up and shut-down times of only few tenth of seconds. This article presents: 1 - the present day situation of thermal plasmas development; 2 - some general considerations about plasma waste processing; 3 - the plasma processes: liquid toxic wastes, solid wastes (contaminated soils and low level radioactive wastes, military wastes, vitrification of incinerators fly ash, municipal wastes processing, treatment of asbestos fibers, treatment of chlorinated industrial wastes), metallurgy wastes (dusts, aluminium slags), medical and ship wastes, perspectives; 4 -conclusion. (J.S.)

Plasma Processing of Metallic and Semiconductor Thin Films in the Fisk Plasma Source

Science.gov (United States)

Lampkin, Gregory; Thomas, Edward, Jr.; Watson, Michael; Wallace, Kent; Chen, Henry; Burger, Arnold

1998-01-01

The use of plasmas to process materials has become widespread throughout the semiconductor industry. Plasmas are used to modify the morphology and chemistry of surfaces. We report on initial plasma processing experiments using the Fisk Plasma Source. Metallic and semiconductor thin films deposited on a silicon substrate have been exposed to argon plasmas. Results of microscopy and chemical analyses of processed materials are presented.

Non equilibrium atomic processes and plasma spectroscopy

International Nuclear Information System (INIS)

Kato, Takako

2003-01-01

Along with the technical progress in plasma spectroscopy, non equilibrium ionization processes have been recently observed. We study non local thermodynamic equilibrium and non ionization equilibrium for various kinds of plasmas. Specifically we discuss non equilibrium atomic processes in magnetically confined plasmas, solar flares and laser produced plasmas using a collisional radiative model based on plasma spectroscopic data. (author)

Inductively coupled plasma mass spectrometer installation modifications in a radioactive contaminated laboratory for the analysis of DOE radioactive waste streams

International Nuclear Information System (INIS)

Giaquinto, J.M.; Keller, J.M.; Meeks, A.M.

1998-01-01

The operation and maintenance of a complex analytical instrument such as an inductively coupled plasma mass spectrometer in a radioactive contaminated environment presents unique problems and challenges that have to be considered in the purchasing and installation process. Considerations such as vendor experience, typical radiation levels, sample matrices encountered during sample analysis, instrument accessibility for maintenance, and upkeep must be incorporated into the decision process. The Radioactive Materials Analytical Laboratory (RMAL) at Oak Ridge National Laboratory (ORNL) recently purchased and installed an inductively coupled plasma mass spectrometer for the analysis of Department of Energy (DOE) radioactive waste streams. This presentation will outline the purchasing decision, installation of the instrument, and how the modifications needed to operate in a radioactive contaminated laboratory do not significantly impact the daily operation and maintenance requirements of the instrument. Also, a contamination survey of the system will be presented which demonstrates the contamination levels in the instrument from the sample introduction system to the detector. (author)

Inductively coupled plasma mass spectrometer installation modifications in a radioactive contaminated laboratory for the analysis of DOE radioactive waste streams

International Nuclear Information System (INIS)

Giaquinto, J.M.; Keller, J.M.; Meeks, A.M.

1997-04-01

The operation and maintenance of a complex analytical instrument such as an inductively coupled plasma mass spectrometer in a radioactive contaminated environment presents unique problems and challenges that have to be considered in the purchasing and installation process. Considerations such as vendor experience, typical radiation levels, sample matrices encountered during sample analysis, instrument accessibility for maintenance, and upkeep must be incorporated into the decision process. The Radioactive Materials Analytical Laboratory (RMAL) at Oak Ridge National Laboratory (ORNL) recently purchased and installed an inductively coupled plasma mass spectrometer for the analysis of Department of Energy (DOE) radioactive waste streams. This presentation will outline the purchasing decision, installation of the instrument, and how the modifications needed to operate in a radioactive contaminated laboratory do not significantly impact the daily operation and maintenance requirements of the instrument. Also, a contamination survey of the system will be presented which demonstrates the contamination levels in the instrument from the sample introduction system to the detector

Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

Directory of Open Access Journals (Sweden)

Jia Ge

2014-01-01

Full Text Available We present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells, in this paper. The deposition of hydrogenated intrinsic amorphous silicon suboxide is accomplished by decomposing hydrogen, silane, and carbon dioxide in an industrial remote inductively coupled plasma platform. Through the investigation on CO2 partial pressure and process temperature, excellent surface passivation quality and optical properties are achieved. It is found that the hydrogen content in the film is much higher than what is commonly reported in intrinsic amorphous silicon due to oxygen incorporation. The observed slow depletion of hydrogen with increasing temperature greatly enhances its process window as well. The effective lifetime of symmetrically passivated samples under the optimal condition exceeds 4.7 ms on planar n-type Czochralski silicon wafers with a resistivity of 1 Ωcm, which is equivalent to an effective surface recombination velocity of less than 1.7 cms−1 and an implied open-circuit voltage (Voc of 741 mV. A comparison with several high quality passivation schemes for solar cells reveals that the developed inductively coupled plasma deposited films show excellent passivation quality. The excellent optical property and resistance to degradation make it an excellent substitute for industrial heterojunction silicon solar cell production.

Characteristics of dust voids in a strongly coupled laboratory dusty plasma

Science.gov (United States)

Bailung, Yoshiko; Deka, T.; Boruah, A.; Sharma, S. K.; Pal, A. R.; Chutia, Joyanti; Bailung, H.

2018-05-01

A void is produced in a strongly coupled dusty plasma by inserting a cylindrical pin (˜0.1 mm diameter) into a radiofrequency discharge argon plasma. The pin is biased externally below the plasma potential to generate the dust void. The Debye sheath model is used to obtain the sheath potential profile and hence to estimate the electric field around the pin. The electric field force and the ion drag force on the dust particles are estimated and their balance accounts well for the maintenance of the size of the void. The effects of neutral density as well as dust density on the void size are studied.

Atomic processes in high temperature plasmas

International Nuclear Information System (INIS)

Hahn, Y.

1990-03-01

Much theoretical and experimental efforts have been expended in recent years to study those atomic processes which are specially relevant to understanding high temperature laboratory plasmas. For magnetically confined fusion plasmas, the temperature range of interest spans from the hundreds of eV at plasma edges to 10 keV at the center of the plasma, where most of the impurity ions are nearly fully ionized. These highly stripped ions interact strongly with electrons in the plasma, leading to further excitation and ionization of the ions, as well as electron capture. Radiations are emitted during these processes, which easily escape to plasma container walls, thus cooling the plasma. One of the dominant modes of radiation emission has been identified with dielectronic recombination. This paper reviews this work

Electrical method for the measurements of volume averaged electron density and effective coupled power to the plasma bulk

Science.gov (United States)

Henault, M.; Wattieaux, G.; Lecas, T.; Renouard, J. P.; Boufendi, L.

2016-02-01

Nanoparticles growing or injected in a low pressure cold plasma generated by a radiofrequency capacitively coupled capacitive discharge induce strong modifications in the electrical parameters of both plasma and discharge. In this paper, a non-intrusive method, based on the measurement of the plasma impedance, is used to determine the volume averaged electron density and effective coupled power to the plasma bulk. Good agreements are found when the results are compared to those given by other well-known and established methods.

A two-dimensional nodal model with turbulent effects for the synthesis of Si nano-particles by inductively coupled thermal plasmas

International Nuclear Information System (INIS)

Colombo, V; Ghedini, E; Gherardi, M; Sanibondi, P; Shigeta, M

2012-01-01

Nano-particle synthesis by means of inductively coupled plasma torches is a material process of large technological interest. Numerous parameters are involved in the optimization of this process; hence the development of numerical models for the prediction of thermal and magneto-fluid dynamics fields, precursor powder trajectories and thermal history, as well as nano-particle formation and growth, is necessary for the up-scaling of these devices from laboratory batch production to an industrial continuous process. In this work, a two-dimensional (2D) discrete-type model (nodal model) for the analysis of nano-powder nucleation and growth is presented, taking into account convection, diffusion and turbulent effects on particle formation. Discrete-type models feature high precision and reveal a great deal of information useful for clarifying the nano-particle formation process. Using Si as the precursor material, 2D simulations of a nano-particle synthesis RF plasma apparatus with a reaction chamber are carried out. Good agreement is found when comparing results obtained with this model with those coming from a well-established nucleation-coupled moment method. Moreover, the extended amount of obtainable information that characterizes the nodal model is underlined. (paper)

Statics and thermodynamics of strongly coupled multicomponent plasmas

International Nuclear Information System (INIS)

Rosenfeld, Y.

1980-01-01

A description of strongly coupled plasmas, in which the direct correlation functions, c/sub i/j(r), are obtained by simple scaling from a universal function, is derived and found to be in full agreement with available computer simulation data, which it thus extends for arbitrary mixtures. It is thermodynamically consistent with the ''ion-sphere'' charge-averaging prediction for the enhancement factors for nuclear reaction rates, the results for which confirm the universality of the bridge functions for mixtures

Quantum Simulations of Strongly Coupled Quark-Gluon Plasma

International Nuclear Information System (INIS)

Filinov, V.S.; Bonitz, M.; Ivanov, Yu.B.

2013-01-01

In recent years, there has been an increasing interest in dynamics and thermodynamics of non-Abelian plasmas at both very high temperature and density. It is expected that a specific state of matter with unconfined quarks and gluons - the so called quark - gluon plasma (QGP) - can exist. The most fundamental way to compute properties of the strongly interacting matter is provided by the lattice QCD. Interpretation of these very complicated computations requires application of various QCD motivated, albeit schematic, models simulating various aspects of the full theory. Moreover, such models are needed in cases when the lattice QCD fails, e.g. at large baryon chemical potentials and out of equilibrium. A semi-classical approximation, based on a point like quasi-particle picture has been recently introduced in literature. It is expected that it allows to treat soft processes in the QGP which are not accessible by the perturbative means and the main features of non-Abelian plasmas can be understood in simple semi-classical terms without the difficulties inherent to a full quantum field theoretical analysis. Here we propose stochastic simulation of thermodynamics and kinetic properties for QGP in semi-classical approximation in the wide region of temperature, density and quasi-particles masses. We extend previous classical nonrelativistic simulations based on a color Coulomb interaction to the quantum regime and take into account the Fermi (Bose) statistics of quarks (gluons) and quantum degeneracy self-consistently. In grand canonical ensemble for finite and zero baryon chemical potential we use the direct quantum path integral Monte Carlo method (PIMC) developed for finite temperature within Feynman formulation of quantum mechanics to do calculations of internal energy, pressure and pair correlation functions. The QGP quasi-particles representing dressed quarks, antiquarks and gluons interact via color quantum Kelbg pseudopotential rigorously derived in for Coulomb

Biomimetic architectures by plasma processing fabrication and applications

CERN Document Server

Chattopadhyay, Surojit

2014-01-01

Photonic structures in the animal kingdom: valuable inspirations for bio-mimetic applications. Moth eye-type anti-reflecting nanostructures by an electron cyclotron resonance plasma. Plasma-processed biomimetic nano/microstructures. Wetting properties of natural and plasma processed biomimetic surfaces. Biomimetic superhydrophobic surface by plasma processing. Biomimetic interfaces of plasma modified titanium alloy.

On the coupling of fields and particles in accelerator and plasma physics

International Nuclear Information System (INIS)

Geloni, Gianluca; Kocharyan, Vitali; Saldin, Evgeni

2016-10-01

In accelerator and plasma physics it is generally accepted that there is no need to solve the dynamical equations for particles motion in manifestly covariant form, that is by using the coordinate-independent proper time to parameterize particle world-lines in space-time. In other words, in order to describe the dynamical processes in the laboratory frame there is no need to use the laws of relativistic kinematics. It is sufficient to take into account the relativistic dependence of the particles momentum on the velocity in the second Newton's law. Therefore, the coupling of fields and particles is based, on the one hand, on the use of result from particle dynamics treated according to Newton's laws in terms of the relativistic three-momentum and, on the other hand, on the use of Maxwell's equations in standard form. In previous papers we argued that this is a misconception. The purpose of this paper is to describe in detail how to calculate the coupling between fields and particles in a correct way and how to develop a new algorithm for a particle tracking code in agreement with the use of Maxwell's equations in their standard form. Advanced textbooks on classical electrodynamics correctly tell us that Maxwell's equations in standard form in the laboratory frame and charged particles are coupled by introducing particles trajectories as projections of particles world-lines onto coordinates of the laboratory frame and by subsequently using the laboratory time to parameterize the trajectory curves. For the first time we showed a difference between conventional and covariant particle tracking results in the laboratory frame. This essential point has never received attention in the physical community. Only the solution of the dynamical equations in covariant form gives the correct coupling between field equations in standard form and particles trajectories in the laboratory frame. We conclude that previous theoretical and simulation results in accelerator and plasma

On the coupling of fields and particles in accelerator and plasma physics

Energy Technology Data Exchange (ETDEWEB)

Geloni, Gianluca [European XFEL GmbH, Hamburg (Germany); Kocharyan, Vitali; Saldin, Evgeni [Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)

2016-10-15

In accelerator and plasma physics it is generally accepted that there is no need to solve the dynamical equations for particles motion in manifestly covariant form, that is by using the coordinate-independent proper time to parameterize particle world-lines in space-time. In other words, in order to describe the dynamical processes in the laboratory frame there is no need to use the laws of relativistic kinematics. It is sufficient to take into account the relativistic dependence of the particles momentum on the velocity in the second Newton's law. Therefore, the coupling of fields and particles is based, on the one hand, on the use of result from particle dynamics treated according to Newton's laws in terms of the relativistic three-momentum and, on the other hand, on the use of Maxwell's equations in standard form. In previous papers we argued that this is a misconception. The purpose of this paper is to describe in detail how to calculate the coupling between fields and particles in a correct way and how to develop a new algorithm for a particle tracking code in agreement with the use of Maxwell's equations in their standard form. Advanced textbooks on classical electrodynamics correctly tell us that Maxwell's equations in standard form in the laboratory frame and charged particles are coupled by introducing particles trajectories as projections of particles world-lines onto coordinates of the laboratory frame and by subsequently using the laboratory time to parameterize the trajectory curves. For the first time we showed a difference between conventional and covariant particle tracking results in the laboratory frame. This essential point has never received attention in the physical community. Only the solution of the dynamical equations in covariant form gives the correct coupling between field equations in standard form and particles trajectories in the laboratory frame. We conclude that previous theoretical and simulation results in

Electrolytic plasma processing of steel surfaces

International Nuclear Information System (INIS)

Bejar, M.A; Araya, R.N; Baeza, B

2006-01-01

The thermo-chemical treatments of steels with plasma is normally carried out in low-pressure ionized gaseous atmospheres. Among the treatments used most often are: nitruration, carburization and boronized. A plasma can also generate at atmospheric pressure. One way to produce it is with an electrochemical cell that works at a relatively high inter-electrode voltage and under conditions of heavy gas generation. This type of plasma is known as electrolytic plasma. This work studies the feasibility of using electrolytic plasma for the surface processing of steels. Two processes were selected: boronized and nitruration., for the hardening of two types of steel: one with low carbon (1020) and one with low alloy (4140). In the case of the nitruration, the 1020 steel was first aluminized. The electrolytes were aqueous solutions of borax for the boronizing and urea for the nitruration. The electrolytic plasmas were classified qualitatively, in relation with their luminosity by low, medium and high intensity. The boronizing was carried out with low intensity plasmas for a period of one hour. The nitruration was performed with plasmas of different intensities and for period of a few minutes to half an hour. The test pieces processed by electrolytic plasma were characterized by micro-hardness tests and X-ray diffraction. The maximum surface hardnesses obtained for the 1020 and 4140 steels were the following: 300 and 700 HV for the boronizing, and 1650 and 1200 HV for the nitruration, respectively. The utilization of an electrolytic plasma permits the surface processing of steels, noticeably increasing their hardness. With this type of plasma some thermo-chemical surface treatments can be done very rapidly as well (CW)

Coupling nanoliter high-performance liquid chromatography to inductively coupled plasma mass spectrometry for arsenic speciation.

Science.gov (United States)

Cheng, Heyong; Shen, Lihuan; Liu, Jinhua; Xu, Zigang; Wang, Yuanchao

2018-04-01

Nanoliter high-performance liquid chromatography shows low consumption of solvents and samples, offering one of the best choices for arsenic speciation in precious samples in combination with inuctively coupled plasma mass spectrometry. A systematic investigation on coupling nanoliter high-performance liquid chromatography to inductively coupled plasma mass spectrometry from instrument design to injected sample volume and mobile phase was performed in this study. Nanoflow mobile phase was delivered by flow splitting using a conventional high-pressure pump with reuse of mobile phase waste. Dead volume was minimized to 60 nL for the sheathless interface based on the previously developed nanonebulizer. Capillary columns for nanoliter high-performance liquid chromatography were found to be sensitive to sample loading volume. An apparent difference was also found between the mobile phases for nanoliter and conventional high-performance liquid chromatography. Baseline separation of arsenite, arsenate, monomethylarsenic, and dimethylarsenic was achieved within 11 min on a 15 cm C 18 capillary column and within 12 min on a 25 cm strong anion exchange column. Detection limits of 0.9-1.8 μg/L were obtained with precisions variable in the range of 1.6-4.2%. A good agreement between determined and certified values of a certified reference material of human urine (GBW 09115) validated its accuracy along with good recoveries (87-102%). © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

ICRF plasma production in Tore Supra: analysis of antenna coupling and plasma properties

International Nuclear Information System (INIS)

Beaumont, B.; Becoulet, A.; Lyssoivan, A.

1999-01-01

A study of RF plasma production frequency range ω. 2ω ci has been undertaken on Tore Supra taking into account antenna coupling predictions of theory and the TEXTOR-94 database. Two scenarios for RF discharges have been tested (fixed frequency of the RF generator): operation with pure toroidal magnetic field, at standard and lower B T and operation in the magnetic configuration with a small vertical (B V ) field superimposed on B T (B V T ). (authors)

The Efficiency of Quartz Particles Evaporation in the Argon Plasma Flow of the RF Inductively Coupled Plasma Torch

Directory of Open Access Journals (Sweden)

Yu. M. Grishin

2017-01-01

Full Text Available Owing to high-power density and high-purity plasma, a RF inductively coupled plasma torch (ICPT is widely used both in research laboratory and in industry. The potential RF ICPT application areas are powders spheroidisation, waste treatment, thermal spraying, etc.In the last decade the investigation was focused on the treatment processes of quartz into polycrystalline silicon. An analysis of these results has shown that the increasing productivity and producing high-purity silicon can be achieved only when using the electrodeless radio-frequency induction plasma torches and in case the optimum conditions for evaporation of SiO2solid particles are realized.Optimization of the RF ICPT design and power parameters calls for a wide range of computational studies. In spite of the fact that to date a large number of efforts to calculate the evaporation efficiency of powder materials have been made, a number of issues, as applied to the problem of obtaining silicon, require further research.In this paper, we present the results of a two-dimensional numerical simulation of the heating and evaporation of quartz particles in the RF ICPT channel with axial flow of gases. The main aim is to determine how the axial position of the central tube (through which the particles are injected into the discharge zone, the dispersion of the quartz powder, the amplitude of the discharge current (and, respectively, flow regimes impact on the evaporation efficiency of quartz particles.The paper presented the numerical modeling results of heating and evaporation processes of quartz particles supplied by transporting gas to the RF ICPT channel with axial gas flow (argon. Defined the impact of the axial position of the central tube, the plasma flow regime, the discharge current, the flow rate of transporting gas, and other parameters on the evaporation efficiency of quartz particles.It is shown that the evaporation efficiency of particles reaches its maximum when their

Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication

International Nuclear Information System (INIS)

Ji, J; Tay, F E H; Miao Jianmin; Sun Jianbo

2006-01-01

This work investigates the isotropic etching properties in inductively coupled plasma (ICP) etcher for microneedle arrays fabrication. The effects of process variables including powers, gas and pressure on needle structure generation are characterized by factorial design of experiment (DOE). The experimental responses of vertical etching depth, lateral etching length, ratio of vertical etching depth to lateral etching length and photoresist etching rate are reported. The relevance of the etching variables is also presented. The obtained etching behaviours for microneedle structure generation will be applied to develop recipes to fabricate microneedles in designed dimensions

Characterization of silicon isotropic etch by inductively coupled plasma etcher for microneedle array fabrication

Energy Technology Data Exchange (ETDEWEB)

Ji, J [Mechanical Engineering National University of Singapore, 119260, Singapore (Singapore); Tay, F E H [Mechanical Engineering National University of Singapore, 119260, Singapore (Singapore); Miao Jianmin [MicroMachines Center, School of Mechanical and Aerospace Engineering, Nanyang Technologica l University, 50 Nanyang Avenue, 639798 (Singapore); Sun Jianbo [MicroMachines Center, School of Mechanical and Aerospace Engineering, Nanyang Technologica l University, 50 Nanyang Avenue, 639798 (Singapore)

2006-04-01

This work investigates the isotropic etching properties in inductively coupled plasma (ICP) etcher for microneedle arrays fabrication. The effects of process variables including powers, gas and pressure on needle structure generation are characterized by factorial design of experiment (DOE). The experimental responses of vertical etching depth, lateral etching length, ratio of vertical etching depth to lateral etching length and photoresist etching rate are reported. The relevance of the etching variables is also presented. The obtained etching behaviours for microneedle structure generation will be applied to develop recipes to fabricate microneedles in designed dimensions.

Plasma processed coating of laser fusion targets

International Nuclear Information System (INIS)

Johnson, W.L.; Letts, S.A.; Myers, D.W.; Crane, J.K.; Illige, J.D.; Hatcher, C.W.

1979-01-01

Coatings for laser fusion targets have been deposited in an inductively coupled discharge device by plasma polymerization. Two feed gases were used: perfluoro-2-butene, which produced a fluorocarbon coating (CF 1 3 ) with a density of 1.8 g/cc, and trans-2-butene which produced a hydrocarbon coating (CH 1 3 ) with a density of 1.0 g/cc. Uniform pin-hole free films have been deposited to a thickness of up to 30 μm of fluorocarbon and up to 110 μm of hydrocarbon. The effect of process variables on surface smoothness has been investigated. The basic defect in the coating has been found to result from shadowing by a small surface irregularity in an anisotropic coating flux

Plasma-chemical processes and systems

International Nuclear Information System (INIS)

Castro B, J.

1987-01-01

The direct applications of plasma technology on chemistry and metallurgy are presented. The physical fundaments of chemically active non-equilibrium plasma, the reaction kinetics, and the physical chemical transformations occuring in the electrical discharges, which are applied in the industry, are analysed. Some plasma chemical systems and processes related to the energy of hydrogen, with the chemical technology and with the metallurgy are described. Emphasis is given to the optimization of the energy effectiveness of these processes to obtain reducers and artificial energetic carriers. (M.C.K.) [pt

Determination of gas temperature and thermometric species in inductively coupled plasmas by emission and diode laser absorption

International Nuclear Information System (INIS)

Bol'shakov, Alexander A; Cruden, Brett A; Sharma, Surendra P

2004-01-01

A vertical cavity surface-emitting laser diode (VCSEL) was used as a spectrally tunable emission source for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3%, 45%, and 90% N 2 in Ar) at pressures of 0.5-70 Pa and inductive powers of 100 and 300 W. The results were compared to the rotational temperature derived from the N 2 emission at the (0,0) vibrational transition of the C 3 Π u -B 3 Π g system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar * and N 2 *) that varied depending on the conditions. A two-dimensional, three-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable us to track the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma

Determination of gas temperature and thermometric species in inductively coupled plasmas by emission and diode laser absorption

Energy Technology Data Exchange (ETDEWEB)

Bol' shakov, Alexander A; Cruden, Brett A; Sharma, Surendra P [NASA Ames Research Center, Moffett Field, CA 94035 (United States)

2004-11-01

A vertical cavity surface-emitting laser diode (VCSEL) was used as a spectrally tunable emission source for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3%, 45%, and 90% N{sub 2} in Ar) at pressures of 0.5-70 Pa and inductive powers of 100 and 300 W. The results were compared to the rotational temperature derived from the N{sub 2} emission at the (0,0) vibrational transition of the C {sup 3}{pi}{sub u}-B {sup 3}{pi} {sub g} system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar{sup *} and N{sub 2}*) that varied depending on the conditions. A two-dimensional, three-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable us to track the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma.

Diagnostic studies of ion beam formation in inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Jacobs, Jenee L. [Iowa State Univ., Ames, IA (United States)

2015-01-01

This dissertation describes a variety of studies focused on the plasma and the ion beam in inductively coupled plasma mass spectrometry (ICP-MS). The ability to use ICP-MS for measurements of trace elements in samples requires the analytes to be efficiently ionized. Updated ionization efficiency tables are discussed for ionization temperatures of 6500 K and 7000 K with an electron density of 1 x 10¹⁵ cm^-3. These values are reflective of the current operating parameters of ICP-MS instruments. Calculations are also discussed for doubly charged (M²⁺) ion formation, neutral metal oxide (MO) ionization, and metal oxide (MO⁺) ion dissociation for similar plasma temperature values. Ionization efficiency results for neutral MO molecules in the ICP have not been reported previously.

Plasma immersion ion implantation: duplex layers from a single process

International Nuclear Information System (INIS)

Hutchings, R.; Collins, G.A.; Tendys, J.

1992-01-01

Plasma immersion ion implantation (PI 3 ) is an alternative non-line-of-sight technique for implanting ions directly from a plasma which surrounds the component to be treated. In contrast to plasma source ion implantation, the PI 3 system uses an inductively coupled r.f. plasma. It is shown that nitrogen can be retained during implantation at elevated temperatures, even for unalloyed steels. This allows controlled diffusion of nitrogen to greater depths, thereby improving the load bearing capacity of the implanted layer. Components can be heated directly, using the energy deposited by the incident ions during the pulsed implantation. The necessary temperature control can be accomplished simply by regulating the frequency and length of the high voltage pulses applied to the component. Chemical depth profiles and microstructural data obtained from H13 tool steel are used to show that PI 3 can, in a single process, effectively produce a duplex subsurface structure. This structure consists of an outer non-equilibrium layer typical of nitrogen implantation (containing in excess of 20 at.% nitrogen) backed by a substantial diffusion zone of much lower nitrogen content. The relationship between implantation temperature and the resultant subsurface microstructure is explored. (orig.)

Determination of Dibutyltin in Sediments Using Isotope Dilution Liquid Chromatography-Inductively Coupled Plasma Mass Spectrometry

International Nuclear Information System (INIS)

Yim, Yong Hyeon; Park, Ji Youn; Han, Myung Sub; Park, Mi Kyung; Kim, Byung Joo; Lim, Young Ran; Hwang, Eui Jin; So, Hun Young

2005-01-01

A method is described for the determination of dibutyltin (DBT) in sediment by isotope dilution using liquid chromatography inductively-coupled plasma/mass spectrometry (LC-ICP/MS). To achieve the highest accuracy and precision, special attentions are paid in optimization and evaluation of overall processes of the analysis including extraction of analytes, characterization of the standards used for calibration and LC-ICP/MS conditions. An approach for characterization of natural abundance DBT standard has been developed by combining inductively-coupled plasma/optical emission spectrometry (ICP/OES) and LC-ICP/MS for the total Sn assay and the analysis of Sn species present as impurities, respectively. An excellent LC condition for separation of organotin species was found, which is suitable for simultaneous DBT and tributyltin (TBT) analysis as well as impurity analysis of DBT standards. Microwave extraction condition was also optimized for high efficiency while preventing species transformation. The present method determines the amount contents of DBT in sediments with expanded uncertainty of less than 5% and its result shows high degree of equivalence with reference values of an international inter-comparison and a certified reference material (CRM) within stated uncertainties

Determination of Dibutyltin in Sediments Using Isotope Dilution Liquid Chromatography-Inductively Coupled Plasma Mass Spectrometry

Energy Technology Data Exchange (ETDEWEB)

Yim, Yong Hyeon; Park, Ji Youn; Han, Myung Sub; Park, Mi Kyung; Kim, Byung Joo; Lim, Young Ran; Hwang, Eui Jin; So, Hun Young [Korea Research Institute of Standards and Science, Daejeon (Korea, Republic of)

2005-03-15

A method is described for the determination of dibutyltin (DBT) in sediment by isotope dilution using liquid chromatography inductively-coupled plasma/mass spectrometry (LC-ICP/MS). To achieve the highest accuracy and precision, special attentions are paid in optimization and evaluation of overall processes of the analysis including extraction of analytes, characterization of the standards used for calibration and LC-ICP/MS conditions. An approach for characterization of natural abundance DBT standard has been developed by combining inductively-coupled plasma/optical emission spectrometry (ICP/OES) and LC-ICP/MS for the total Sn assay and the analysis of Sn species present as impurities, respectively. An excellent LC condition for separation of organotin species was found, which is suitable for simultaneous DBT and tributyltin (TBT) analysis as well as impurity analysis of DBT standards. Microwave extraction condition was also optimized for high efficiency while preventing species transformation. The present method determines the amount contents of DBT in sediments with expanded uncertainty of less than 5% and its result shows high degree of equivalence with reference values of an international inter-comparison and a certified reference material (CRM) within stated uncertainties.

Minimally-invasive Laser Ablation Inductively Coupled Plasma Mass Spectrometry analysis of model ancient copper alloys

Energy Technology Data Exchange (ETDEWEB)

Walaszek, Damian [University of Warsaw, Faculty of Chemistry, Biological and Chemical Research Centre, Żwirki i Wigury 101, 02-089 Warszawa (Poland); Laboratory for Analytical Chemistry, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf (Switzerland); Senn, Marianne; Wichser, Adrian [Laboratory for Analytical Chemistry, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf (Switzerland); Faller, Markus [Laboratory for Jointing Technology and Corrosion, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf (Switzerland); Wagner, Barbara; Bulska, Ewa [University of Warsaw, Faculty of Chemistry, Biological and Chemical Research Centre, Żwirki i Wigury 101, 02-089 Warszawa (Poland); Ulrich, Andrea [Laboratory for Analytical Chemistry, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf (Switzerland)

2014-09-01

This work describes an evaluation of a strategy for multi-elemental analysis of typical ancient bronzes (copper, lead bronze and tin bronze) by means of laser ablation inductively coupled plasma mass spectrometry (LA-ICPMS).The samples originating from archeological experiments on ancient metal smelting processes using direct reduction in a ‘bloomery’ furnace as well as historical casting techniques were investigated with the use of the previously proposed analytical procedure, including metallurgical observation and preliminary visual estimation of the homogeneity of the samples. The results of LA-ICPMS analysis were compared to the results of bulk composition obtained by X-ray fluorescence spectrometry (XRF) and by inductively coupled plasma mass spectrometry (ICPMS) after acid digestion. These results were coherent for most of the elements confirming the usefulness of the proposed analytical procedure, however the reliability of the quantitative information about the content of the most heterogeneously distributed elements was also discussed in more detail. - Highlights: • The previously proposed procedure was evaluated by analysis of model copper alloys. • The LA-ICPMS results were comparable to the obtained by means of XRF and ICPMS. • LA-ICPMS results indicated the usefulness of the proposed analytical procedure.

Effect of antenna size on electron kinetics in inductively coupled plasmas

Energy Technology Data Exchange (ETDEWEB)

Lee, Hyo-Chang; Chung, Chin-Wook [Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

2013-10-15

Spatially resolved measurements of electron energy distribution functions (EEDFs) are investigated in inductively coupled plasmas with two planar antenna coils. When the plasma is sustained by the antenna with a diameter of 18 cm, the nonlocal kinetics is preserved in the argon gas pressure range from 2 mTorr to 20 mTorr. However, electron kinetics transit from nonlocal kinetics to local kinetics in discharge sustained by the antenna coil with diameter 34 cm. The results suggest that antenna size as well as chamber length are important parameters for the transition of the electron kinetics. Spatial variations of plasma potential, effective electron temperature, and EEDF in terms of total electron energy scale are also presented.

Analytical solution for a coaxial plasma gun: Weak coupling limit

International Nuclear Information System (INIS)

Dietz, D.

1987-01-01

The analytical solution of the system of coupled ODE's which describes the time evolution of an ideal (i.e., zero resistance) coaxial plasma gun operating in the snowplow mode is obtained in the weak coupling limit, i.e, when the gun is fully influenced by the driving (RLC) circuit in which it resides but the circuit is negligibly influenced by the gun. Criteria for the validity of this limit are derived and numerical examples are presented. Although others have obtained approximate, asymptotic and numerical solutions of the equations, the present analytical results seem not to have appeared previously in the literature

The determination of transition probabilities with an inductively-coupled plasma discharge

International Nuclear Information System (INIS)

Nieuwoudt, G.

1984-03-01

The 27 MHz inductively-coupled plasma discharge (ICP) is used for the determination of relative transition probabilities of the 451, 459 and 470 nm argon spectral lines. The temperature of the argon plasma is determined with hydrogen as thermometric specie, because of the accurate transition probabilities ( approximately 1% uncertainty) there of. The relative transition probabilities of the specific argon spectral lines were determined by substitution of the measured spectral radiances thereof, together with the hydrogen temperature, in the two-line equation of temperature measurement

-3000 V dc bias Ti oxidation by inductively coupled plasma

International Nuclear Information System (INIS)

Valencia-Alvarado, R; Lopez-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Pena-Eguiluz, R; Munoz-Castro, A E; De la Piedad-Beneitez, A; De la Rosa-Vazquez, J

2008-01-01

Broadening the outer oxidized layer of titanium by means of plasmas commands considerable interest in the biomedical research area due to its potential in human biocompatibility enhancement. Some early results of titanium substrate superficial oxidation experiments which have been conducted in a cylindrical vessel inductively coupled to a 13.56 MHz RF generator with a 500 W output are presented. The oxidation process was carried out in a 20 % oxygen and 80 % argon mixture at work pressures in the 5x10 -3 -1 mbar range, while the samples were dc biased down to -3000 V. The substrate temperature appears to be directly dependent on this voltage, reaching 685 deg. C at the maximum bias when a diffusive oxidation process gives rise to the TiO 2 and α-TiO rutile phases. These were characterized by means of x-ray diffraction and scanning electron microscopy revealing atomic percentage concentrations of oxygen, with respect to those of titanium, between 68 and 13 at.%. The optimum modified layer depth reached 5 μm at a 5x10 -2 mbar work pressure.

Theoretical investigation of phase-controlled bias effect in capacitively coupled plasma discharges

International Nuclear Information System (INIS)

Kwon, Deuk-Chul; Yoon, Jung-Sik

2011-01-01

We theoretically investigated the effect of phase difference between powered electrodes in capacitively coupled plasma (CCP) discharges. Previous experimental result has shown that the plasma potential could be controlled by using a phase-shift controller in CCP discharges. In this work, based on the previously developed radio frequency sheath models, we developed a circuit model to self-consistently determine the bias voltage from the plasma parameters. Results show that the present theoretical model explains the experimental results quite well and there is an optimum value of the phase difference for which the V dc /V pp ratio becomes a minimum.

State-space modeling of the radio frequency inductively-coupled plasma generator

International Nuclear Information System (INIS)

Dewangan, Rakesh Kumar; Punjabi, Sangeeta B; Mangalvedekar, H A; Lande, B K; Joshi, N K; Barve, D N

2010-01-01

Computational fluid dynamics models of RF-ICP are useful in understanding the basic transport phenomenon in an ICP torch under a wide variety of operating conditions. However, these models lack the ability to evaluate the effects of the plasma condition on the RF generator. In this paper, simulation of an induction plasma generator has been done using state space modelling by considering inductively coupled plasma as a part of RF network .The time dependent response of the RF-ICP generator circuit to given input excitation has been computed by extracting the circuit's state-space variables and their constraint matrices. MATLAB 7.1 software has been used to solve the state equations. The values of RF coil current, frequency and plasma power has been measured experimentally also at different plate bias voltage. The simulated model is able to predict RF coil current, frequency, plasma power, overall efficiency of the generator. The simulated and measured values are in agreement with each other. This model can prove useful as a design tool for the Induction plasma generator.

HEMOFILTRATION AND COUPLED PLASMA FILTRATION ADSORPTION IMPACT ON TACROLIMUS BLOOD CONCENTRATION IN RENAL TRANSPLANT RECIPIENTS

Directory of Open Access Journals (Sweden)

A.V. Vatazin

2014-01-01

Full Text Available Aim. To study the effect of hemofi ltration and coupled plasma fi ltration adsorption on tacrolimus blood concentration in renal transplant recipients.Methods and results. The study included 8 renal transplant recipients. In these patients immediately after the operation was performed the coupled plasma fi ltration adsorption with hemofiltration using a cartridge Mediasorb to reduce the severity of reperfusion injury. We have found that during this extracorporeal blood correction procedure there was statistically not signifi cant decrease of tacrolimus blood concentration. However, concentration of tacrolimus remained in the therapeutic range even after the procedure and it was not signifi cantly different from the control point С0.Conclusion. Coupled plasma fi ltration adsorption is safe in renal transplant recipients and has no signifi cant impact on tacrolimus blood concentration. However, the downward trend in the concentration of tacrolimus in the course of these procedures, especially in continuous or semicontinuous mode, as well as in patients with low hematocrit and hypoalbuminemia, requires individual monitoring.

Beam-generated plasmas for processing applications

Science.gov (United States)

Meger, R. A.; Blackwell, D. D.; Fernsler, R. F.; Lampe, M.; Leonhardt, D.; Manheimer, W. M.; Murphy, D. P.; Walton, S. G.

2001-05-01

The use of moderate energy electron beams (e-beams) to generate plasma can provide greater control and larger area than existing techniques for processing applications. Kilovolt energy electrons have the ability to efficiently ionize low pressure neutral gas nearly independent of composition. This results in a low-temperature, high-density plasma of nearly controllable composition generated in the beam channel. By confining the electron beam magnetically the plasma generation region can be designated independent of surrounding structures. Particle fluxes to surfaces can then be controlled by the beam and gas parameters, system geometry, and the externally applied rf bias. The Large Area Plasma Processing System (LAPPS) utilizes a 1-5 kV, 2-10 mA/cm2 sheet beam of electrons to generate a 1011-1012cm-3 density, 1 eV electron temperature plasma. Plasma sheets of up to 60×60 cm2 area have been generated in a variety of molecular and atomic gases using both pulsed and cw e-beam sources. The theoretical basis for the plasma production and decay is presented along with experiments measuring the plasma density, temperature, and potential. Particle fluxes to nearby surfaces are measured along with the effects of radio frequency biasing. The LAPPS source is found to generate large-area plasmas suitable for materials processing.

Multi-chord fiber-coupled interferometry of supersonic plasma jets (invited)

International Nuclear Information System (INIS)

Merritt, Elizabeth C.; Lynn, Alan G.; Gilmore, Mark A.; Thoma, Carsten; Loverich, John; Hsu, Scott C.

2012-01-01

A multi-chord fiber-coupled interferometer is being used to make time-resolved density measurements of supersonic argon plasma jets on the Plasma Liner Experiment. The long coherence length of the laser (>10 m) allows signal and reference path lengths to be mismatched by many meters without signal degradation, making for a greatly simplified optical layout. Measured interferometry phase shifts are consistent with a partially ionized plasma in which both positive and negative phase shift values are observed depending on the ionization fraction. In this case, both free electrons and bound electrons in ions and neutral atoms contribute to the index of refraction. This paper illustrates how the interferometry data, aided by numerical modeling, are used to derive total jet density, jet propagation velocity (∼15–50 km/s), jet length (∼20–100 cm), and 3D expansion.

Fundamental processes in the expansion, energization, and coupling of single- and multi-Ion plasmas in space: Laboratory simulation experiments

Science.gov (United States)

Szuszczewicz, E. P.; Bateman, T. T.

1996-01-01

We have conducted a laboratory investigation into the physics of plasma expansions and their associated energization processes. We studied single- and multi-ion plasma processes in self-expansions, and included light and heavy ions and heavy/light mixtures to encompass the phenomenological regimes of the solar and polar winds and the AMPTE and CRRES chemical release programs. The laboratory experiments provided spatially-distributed time-dependent measurements of total plasma density, temperature, and density fluctuation power spectra with the data confirming the long-theorized electron energization process in an expanding cloud - a result that was impossible to determine in spaceborne experiments (as e.g., in the CRRES program). These results provided the missing link in previous laboratory and spaceborne programs. confirming important elements in our understanding of such solar-terrestrial processes as manifested in expanding plasmas in the solar wind (e.g., CMES) and in ionospheric outflow in plasmaspheric fluctuate refilling after a storm. The energization signatures were seen in an entire series of runs that varied the ion species (Ar', Xe', Kr' and Ne'), and correlative studies included spectral analyses of electrostatic waves collocated with the energized electron distributions. In all cases wave energies were most intense during the times in which the suprathermal populations were present, with wave intensity increasing with the intensity of the suprathermal electron population. This is consistent with theoretical expectations wherein the energization process is directly attributable to wave particle interactions. No resonance conditions were observed, in an overall framework in which the general wave characteristics were broadband with power decreasing with increasing frequency.

Influence of driving frequency on oxygen atom density in O2 radio frequency capacitively coupled plasma

International Nuclear Information System (INIS)

Kitajima, Takeshi; Noro, Kouichi; Nakano, Toshiki; Makabe, Toshiaki

2004-01-01

The influence of the driving frequency on the absolute oxygen atom density in an O 2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated using vacuum ultraviolet absorption spectroscopy with pulse modulation of the main plasma. A low-power operation of a compact inductively coupled plasma light source was enabled to avoid the significant measurement errors caused by self-absorption in the light source. The pulse modulation of the main plasma enabled accurate absorption measurement for high plasma density conditions by eliminating background signals due to light emission from the main plasma. As for the effects of the driving frequency, the effect of VHF (100 MHz) drive on oxygen atom production was small because of the modest increase in plasma density of electronegative O 2 in contrast to the significant increase in electron density previously observed for electropositive Ar. The recombination coefficient of oxygen atoms on the electrode surface was obtained from a decay rate in the afterglow by comparison with a diffusion model, and it showed agreement with previously reported values for several electrode materials

Inductively coupled plasma mass spectrometry in the analysis of biological samples and pharmaceutical drugs

Science.gov (United States)

Ossipov, K.; Seregina, I. F.; Bolshov, M. A.

2016-04-01

Inductively coupled plasma mass spectrometry (ICP-MS) is widely used in the analysis of biological samples (whole blood, serum, blood plasma, urine, tissues, etc.) and pharmaceutical drugs. The shortcomings of this method related to spectral and non-spectral interferences are manifested in full measure in determination of the target analytes in these complex samples strongly differing in composition. The spectral interferences are caused by similarity of masses of the target component and sample matrix components. Non-spectral interferences are related to the influence of sample matrix components on the physicochemical processes taking place during formation and transportation of liquid sample aerosols into the plasma, on the value and spatial distribution of plasma temperature and on the transmission of the ion beam from the interface to mass spectrometer detector. The review is devoted to analysis of different mechanisms of appearance of non-spectral interferences and to ways for their minimization or elimination. Special attention is paid to the techniques of biological sample preparation, which largely determine the mechanisms of the influence of sample composition on the results of element determination. The ways of lowering non-spectral interferences by instrumental parameter tuning and application of internal standards are considered. The bibliography includes 189 references.

Understanding plasma spraying process and characteristics of DC-arc plasma gun (PJ-100

Directory of Open Access Journals (Sweden)

Jovana Ružić

2012-12-01

Full Text Available The thermal spray processes are a group of coating processes used to apply metallic or non-metallic coatings. In these processes energy sources are used to heat the coating material (in the form of powder, wire, or rod form to a molten or semi-molten state and accelerated towards a prepared surface by either carrier gases or atomization jets. In plasma spraying process, the spraying material is generally in the form of powder and requires a carrier gas to feed the powder into the plasma jet, which is passing between the hot cathode and the cylindrical nozzle-shaped anode. The design of DC plasma gun (PJ - 100 is designed and manufactured in Serbia. Plasma spaying process, the powder injection with the heat, momentum and mass transfers between particles and plasma jet, and the latest developments related to the production of DC plasma gun are described in this article.

Formation Of Carbon Oxides In CH4/O2 Plasmas Produced By Inductively Coupled RF Discharges At Low Pressure

International Nuclear Information System (INIS)

Moeller, Ivonne; Soltwisch, Henning

2003-01-01

The formation of CO and CO2 has been studied in inductively coupled rf (13.56 MHz) discharges with varied mixtures of CH4 and O2 as feed gases at a total pressure of 10 Pa, flow rates of <10 sccm, and input powers of <500 W. The primary diagnostic tool has been TDLAS (tunable diode laser absorption spectroscopy) to measure absolute concentrations of molecular species as well as their kinetic and rovibrational temperatures. Of particular interest is the sudden transition between different modes of power coupling (capacitive and inductive mode, resp.) and the related changes of the plasma composition. We have found that the power threshold for this transition exhibits a clear hysteresis and depends on the oxygen content. Comparing the ratio of the CO- and CO2-concentrations in capacitive mode with corresponding data from a parallel-plate discharge, clear differences have been observed. The findings can partly be explained on the basis of plasma-chemical reaction chains using tabulated cross-sections in combination with estimations of the electron energy distribution function. Some observations (as, e.g. the presence of CO in inductively coupled plasmas that are fed by pure oxygen) cannot be understood from volume reactions only but point to an important role of surface processes, which depend on the materials of the discharge chamber and on its history and cleaning method

Online Coupling of Flow-Field Flow Fractionation and Single Particle Inductively Coupled Plasma-Mass Spectrometry: Characterization of Nanoparticle Surface Coating Thickness and Aggregation State

Science.gov (United States)

Surface coating thickness and aggregation state have strong influence on the environmental fate, transport, and toxicity of engineered nanomaterials. In this study, flow-field flow fractionation coupled on-line with single particle inductively coupled plasma-mass spectrometry i...

Electromagneto-mechanical coupling analysis of a test module in J-TEXT Tokamak during plasma disruption

Energy Technology Data Exchange (ETDEWEB)

Dong, Haijie; Yuan, Zhensheng; Yuan, Hongwei; Pei, Cuixiang [State Key Laboratory for Strength and Vibration of Mechanical Structures, Shanxi Engineering Research Center for NDT and Structural Integrity Evaluation Xi’an Jiaotong University, Xi’an 710049 (China); Chen, Zhenmao, E-mail: chenzm@mail.xjtu.edu.cn [State Key Laboratory for Strength and Vibration of Mechanical Structures, Shanxi Engineering Research Center for NDT and Structural Integrity Evaluation Xi’an Jiaotong University, Xi’an 710049 (China); Yang, Jinhong; Wang, Weihua [Institute of Applied Physics of AOA, Hefei 230031 (China)

2016-11-01

In this paper, the dynamic response during plasma disruption of a test blanket module in vacuum vessel (VV) of the Joint TEXT (J-TEXT), which is an experimental Tokamak device with iron core, was simulated by applying a program developed by authors on the ANSYS platform using its parametric design language (APDL). The moving coordinate method as well as the load transfer and sequential coupling strategy were adopted to cope with the electromagneto-mechanical coupling effect. To establish the numerical model, the influence of the iron core on the eddy current and electromagnetic (EM) force during disruption was numerically investigated at first and the influence was found not significant. Together with the geometrical features of the J-TEXT Tokamak structure, 180° sector models without magnetic core were finally established for the EM field and the structural response simulations. To obtain the source plasma current, the plasma current evolution during disruption was simulated by using the Tokamak Simulation Code (TSC). With the numerical models and the source plasma current, the dynamic response of both the VV structure and the test module were calculated. The numerical results show that the maximum stress of the test module is in safe range, and the magnetic damping effect can weaken vibration of the test module. In addition, simulation without considering the coupling effect was carried out, which shows that the influence of coupling effect is not significant for the peak stress of the J-TEXT disruption problem.

Trace determination of Pu by LIF in an inductively coupled plasma

International Nuclear Information System (INIS)

Mauchien, P.; Briand, A.; Moulin, C.

1989-01-01

Inductively Coupled Plasma/Emission Spectrometry (ICP/ES) technique is largely used in the nuclear industry as an elementary analytical technique. Nevertheless, when the sample to analyse presents elements with a lot of emission spectral lines, spectral interferences lead to limited sensitivity. This is the case for Pu determination in presence of large U concentration. In pure aqueous solution, the limit of detection (LOD) for Pu is 10 μg/1. In presence of U, the LOD is determined by a ratio U/Pu = 1000. Pulsed Laser Induced Fluorescence (LIF) spectrometry is known to be a very selective technique when associated with an Inductively Coupled Plasma source. The absolute sensitivity is better by 2 or 3 orders of magnitude; its principle is based on selective excitation of the ionic species in the plasma followed by fluorescence radiation detection of these species; this radiation being practically free from spectral interferences, it is possible to improve the relative LOD. In this presentation, experimental results performed at Cogema/Marcoule laboratory are presented. After the experimental set-up description, first results of LIF are shown: - very good selectivity is effectively obtained, - a series of analytical results obtained with excitation scanning from the visible to the U.V. show that sensitivity of LIF technique is strictly related to the spectroscopic scheme

Plasma surface interaction processes and possible synergisms

International Nuclear Information System (INIS)

Behrisch, R.; Roberto, J.B.

1984-08-01

The process determining the plasma surface interaction in today's high temperature plasma experiments are investigated following several lines. First, in plasma devices, the particle and energy fluxes to the different first wall areas the fluxes from the walls back into the plasma are measured and the boundary plasma parameters are determined. The surface composition and structure of the walls, limiters and divertor plates are analyzed following exposure to many discharges. Secondly, the different surface processes which are expected to contribute to the plasma surface interaction (particularly to hydrogen particle balance and impurity introduction) are studied in simulation experiments using well defined particle beams

Fluid model of inductively coupled plasma etcher based on COMSOL

International Nuclear Information System (INIS)

Cheng Jia; Ji Linhong; Zhu Yu; Shi Yixiang

2010-01-01

Fluid dynamic models are generally appropriate for the investigation of inductively coupled plasmas. A commercial ICP etcher filled with argon plasma is simulated in this study. The simulation is based on a multiphysical software, COMSOL(TM), which is a partial differential equation solver. Just as with other plasma fluid models, there are drift-diffusion approximations for ions, the quasi-neutrality assumption for electrons movements, reduced Maxwell equations for electromagnetic fields, electron energy equations for electron temperatures and the Navier-Stokes equation for neutral background gas. The two-dimensional distribution of plasma parameters are shown at 200 W of power and 1.33 Pa (10 mTorr) of pressure. Then the profile comparison of the electron number density and temperature with respect to power is illustrated. Finally we believe that there might be some disagreement between the predicted values and the real ones, and the reasons for this difference would be the Maxwellian eedf assumption and the lack of the cross sections of collisions and the reaction rates. (semiconductor physics)

Similarity analysis for the high-pressure inductively coupled plasma source

International Nuclear Information System (INIS)

Vanden-Abeele, D; Degrez, G

2004-01-01

It is well known that the optimal operating parameters of an inductively coupled plasma (ICP) torch strongly depend upon its dimensions. To understand this relationship better, we derive a dimensionless form of the equations governing the behaviour of high-pressure ICPs. The requirement of similarity then naturally leads to expressions for the operating parameters as a function of the plasma radius. In addition to the well-known scaling law for frequency, surprising results appear for the dependence of the mass flow rate, dissipated power and operating pressure upon the plasma radius. While the obtained laws do not appear to be in good agreement with empirical results in the literature, their correctness is supported by detailed numerical calculations of ICP sources of varying diameters. The approximations of local thermodynamic equilibrium and negligible radiative losses restrict the validity of our results and can be responsible for the disagreement with empirical data. The derived scaling laws are useful for the design of new plasma torches and may provide explanations for the unsteadiness observed in certain existing ICP sources

Hydrogen Plasma Processing of Iron Ore

Science.gov (United States)

Sabat, Kali Charan; Murphy, Anthony B.

2017-06-01

Iron is currently produced by carbothermic reduction of oxide ores. This is a multiple-stage process that requires large-scale equipment and high capital investment, and produces large amounts of CO2. An alternative to carbothermic reduction is reduction using a hydrogen plasma, which comprises vibrationally excited molecular, atomic, and ionic states of hydrogen, all of which can reduce iron oxides, even at low temperatures. Besides the thermodynamic and kinetic advantages of a hydrogen plasma, the byproduct of the reaction is water, which does not pose any environmental problems. A review of the theory and practice of iron ore reduction using a hydrogen plasma is presented. The thermodynamic and kinetic aspects are considered, with molecular, atomic and ionic hydrogen considered separately. The importance of vibrationally excited hydrogen molecules in overcoming the activation energy barriers, and in transferring energy to the iron oxide, is emphasized. Both thermal and nonthermal plasmas are considered. The thermophysical properties of hydrogen and argon-hydrogen plasmas are discussed, and their influence on the constriction and flow in the of arc plasmas is considered. The published R&D on hydrogen plasma reduction of iron oxide is reviewed, with both the reduction of molten iron ore and in-flight reduction of iron ore particles being considered. Finally, the technical and economic feasibility of the process are discussed. It is shown that hydrogen plasma processing requires less energy than carbothermic reduction, mainly because pelletization, sintering, and cokemaking are not required. Moreover, the formation of the greenhouse gas CO2 as a byproduct is avoided. In-flight reduction has the potential for a throughput at least equivalent to the blast furnace process. It is concluded that hydrogen plasma reduction of iron ore is a potentially attractive alternative to standard methods.

Method and apparatus for monitoring plasma processing operations

Science.gov (United States)

Smith, Jr., Michael Lane; Ward, Pamela Denise Peardon; Stevenson, Joel O'Don

2002-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). Another aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system. A final aspect of the present invention relates to a network a plurality of plasma monitoring systems, including with remote capabilities (i.e., outside of the clean room).

Basic Properties of Plasma-Neutral Coupling in the Solar Atmosphere

Science.gov (United States)

Goodman, Michael

2015-04-01

Plasma-neutral coupling (PNC) in the solar atmosphere concerns the effects of collisions between charged and neutral species’. It is most important in the chromosphere, which is the weakly ionized, strongly magnetized region between the weakly ionized, weakly magnetized photosphere and the strongly ionized, strongly magnetized corona. The charged species’ are mainly electrons, protons, and singly charged heavy ions. The neutral species’ are mainly hydrogen and helium. The resistivity due to PNC can be several orders of magnitude larger than the Spitzer resistivity. This enhanced resistivity is confined to the chromosphere, and provides a highly efficient dissipation mechanism unique to the chromosphere. PNC may play an important role in many processes such as heating and acceleration of plasma; wave generation, propagation, and dissipation; magnetic reconnection; maintaining the near force-free state of the corona; and limiting mass flux into the corona. It might play a major role in chromospheric heating, and be responsible for the existence of the chromosphere as a relatively thin layer of plasma that emits a net radiative flux 10-100 times greater than that of the overlying corona. The required heating rate might be generated by Pedersen current dissipation triggered by the rapid increase of magnetization with height in the lower chromosphere, where most of the net radiative flux is emitted. Relatively cool regions of the chromosphere might be regions of minimal Pedersen current dissipation due to smaller magnetic field strength or perpendicular current density. This talk will discuss PNC from an MHD point of view, and focus on the basic parameters that determine its effectiveness. These parameters are ionization fraction, magnetization, and the electric field that drives current perpendicular to the magnetic field. By influencing this current and the electric field that drives it, PNC directly influences the rate at which energy is exchanged between the

Ion deposition by inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Hu, K.; Houk, R.S.

1996-01-01

An atmospheric pressure inductively coupled plasma (ICP) is used with a quadrupole mass spectrometer (MS) for ion deposition. The deposited element is introduced as a nebulized aqueous solution. Modifications to the ICP-MS device allow generation and deposition of a mass-resolved beam of 165 Ho + at 5x10 12 ions s -1 . The ICP is a universal, multielement ion source that can potentially be used for applications such as deposition of mixtures of widely varying stoichiometry or of alternating layers of different elements. copyright 1996 American Vacuum Society

Thermodynamics of strongly coupled repulsive Yukawa particles in ambient neutralizing plasma: Thermodynamic instability and the possibility of observation in fine particle plasmas

International Nuclear Information System (INIS)

Totsuji, Hiroo

2008-01-01

The thermodynamics is analyzed for a system composed of particles with hard cores, interacting via the repulsive Yukawa potential (Yukawa particulates), and neutralizing ambient (background) plasma. An approximate equation of state is given with proper account of the contribution of ambient plasma and it is shown that there exists a possibility for the total isothermal compressibility of Yukawa particulates and ambient plasma to diverge when the coupling between Yukawa particulates is sufficiently strong. In this case, the system undergoes a transition into separated phases with different densities and we have a critical point for this phase separation. Examples of approximate phase diagrams related to this transition are given. It is emphasized that the critical point can be in the solid phase and we have the possibility to observe a solid-solid phase separation. The applicability of these results to fine particle plasmas is investigated. It is shown that, though the values of the characteristic parameters are semiquantitative due to the effects not described by this model, these phenomena are expected to be observed in fine particle plasmas, when approximately isotropic bulk systems are realized with a very strong coupling between fine particles.

Thermodynamics of strongly coupled repulsive Yukawa particles in ambient neutralizing plasma: Thermodynamic instability and the possibility of observation in fine particle plasmas

Science.gov (United States)

Totsuji, Hiroo

2008-07-01

The thermodynamics is analyzed for a system composed of particles with hard cores, interacting via the repulsive Yukawa potential (Yukawa particulates), and neutralizing ambient (background) plasma. An approximate equation of state is given with proper account of the contribution of ambient plasma and it is shown that there exists a possibility for the total isothermal compressibility of Yukawa particulates and ambient plasma to diverge when the coupling between Yukawa particulates is sufficiently strong. In this case, the system undergoes a transition into separated phases with different densities and we have a critical point for this phase separation. Examples of approximate phase diagrams related to this transition are given. It is emphasized that the critical point can be in the solid phase and we have the possibility to observe a solid-solid phase separation. The applicability of these results to fine particle plasmas is investigated. It is shown that, though the values of the characteristic parameters are semiquantitative due to the effects not described by this model, these phenomena are expected to be observed in fine particle plasmas, when approximately isotropic bulk systems are realized with a very strong coupling between fine particles.

How initial representations shape coupled learning processes

DEFF Research Database (Denmark)

Puranam, Phanish; Swamy, M.

2016-01-01

Coupled learning processes, in which specialists from different domains learn how to make interdependent choices among alternatives, are common in organizations. We explore the role played by initial representations held by the learners in coupled learning processes using a formal agent-based model....... We find that initial representations have important consequences for the success of the coupled learning process, particularly when communication is constrained and individual rates of learning are high. Under these conditions, initial representations that generate incorrect beliefs can outperform...... one that does not discriminate among alternatives, or even a mix of correct and incorrect representations among the learners. We draw implications for the design of coupled learning processes in organizations. © 2016 INFORMS....

Plasma Technologies of Solid Fuels Processing

International Nuclear Information System (INIS)

Karpenko, E.I.; Messerle, V.E.; Ustimenko, A.

2003-01-01

Use of fuel processing plasma technologies improves ecological and economical indexes of low-grade coal utilization at thermal power plants. This paper presents experimental plasma plant 70 k W of power and 11 kg per hour of coal productivity. On the base of material and heat balances integral indexes of the process of plasma gasification of Podmoskovny brown coal 48% of ash content were found. Synthesis gas with concentration 85.2% was got. Hydrogen concentration in the synthesis gas was higher than carbon monoxide one. Ratio H 2 :CO in synthesis gas was 1.4-1.5. It was shown that steam consumption and temperature of the process increase causes H 2 concentration and coal gasification degree increase. Fulfilled experiments and comparison of their result with theoretical investigations allowed creating pilot experimental plant for plasma processing of low-grade coals. The power of the pilot plant is 1000 k W and coal productivity is 300 kg/h. (author)

Nonlinear electromagnetic fields in 0.5 MHz inductively coupled plasmas

DEFF Research Database (Denmark)

Ostrikov, K.N.; Tsakadze, E.L.; Xu, S.

2003-01-01

Radial profiles of magnetic fields in the electrostatic (E) and electromagnetic (H) modes of low-frequency (similar to500 kHz) inductively coupled plasmas have been measured using miniature magnetic probes. In the low-power (similar to170 W) E-mode, the magnetic field pattern is purely linear......, with the fundamental frequency harmonics only. After transition to higher-power (similar to1130 W) H-mode, the second-harmonic nonlinear azimuthal magnetic field B-phi(2omega) that is in 4-6 times larger than the fundamental frequency component B-phi(omega), has been observed. A simplified plasma fluid model...... explaining the generation of the second harmonics of the azimuthal magnetic field in the plasma source is proposed. The nonlinear second harmonic poloidal (r-z) rf current generating the azimuthal magnetic field B-phi(2omega) is attributed to nonlinear interactions between the fundamental frequency radial...

Time-Resolved Quantum Cascade Laser Absorption Spectroscopy of Pulsed Plasma Assisted Chemical Vapor Deposition Processes Containing BCl3

Science.gov (United States)

Lang, Norbert; Hempel, Frank; Strämke, Siegfried; Röpcke, Jürgen

2011-08-01

In situ measurements are reported giving insight into the plasma chemical conversion of the precursor BCl3 in industrial applications of boriding plasmas. For the online monitoring of its ground state concentration, quantum cascade laser absorption spectroscopy (QCLAS) in the mid-infrared spectral range was applied in a plasma assisted chemical vapor deposition (PACVD) reactor. A compact quantum cascade laser measurement and control system (Q-MACS) was developed to allow a flexible and completely dust-sealed optical coupling to the reactor chamber of an industrial plasma surface modification system. The process under the study was a pulsed DC plasma with periodically injected BCl3 at 200 Pa. A synchronization of the Q-MACS with the process control unit enabled an insight into individual process cycles with a sensitivity of 10-6 cm-1·Hz-1/2. Different fragmentation rates of the precursor were found during an individual process cycle. The detected BCl3 concentrations were in the order of 1014 molecules·cm-3. The reported results of in situ monitoring with QCLAS demonstrate the potential for effective optimization procedures in industrial PACVD processes.

Difference in chemical reactions in bulk plasma and sheath regions during surface modification of graphene oxide film using capacitively coupled NH{sub 3} plasma

Energy Technology Data Exchange (ETDEWEB)

Lee, Sung-Youp; Kim, Chan; Kim, Hong Tak, E-mail: zam89blue@gmail.com [Department of Physics, Kyungpook National University, Daegu 702-701 (Korea, Republic of)

2015-09-14

Reduced graphene oxide (r-GO) films were obtained from capacitively coupled NH{sub 3} plasma treatment of spin-coated graphene oxide (GO) films at room temperature. Variations were evaluated according to the two plasma treatment regions: the bulk plasma region (R{sub bulk}) and the sheath region (R{sub sheath}). Reduction and nitridation of the GO films began as soon as the NH{sub 3} plasma was exposed to both regions. However, with the increase in treatment time, the reduction and nitridation reactions differed in each region. In the R{sub bulk}, NH{sub 3} plasma ions reacted chemically with oxygen functional groups on the GO films, which was highly effective for reduction and nitridation. While in the R{sub sheath}, physical reactions by ion bombardment were dominant because plasma ions were accelerated by the strong electrical field. The accelerated plasma ions reacted not only with the oxygen functional groups but also with the broken carbon chains, which caused the removal of the GO films by the formation of hydrocarbon gas species. These results showed that reduction and nitridation in the R{sub bulk} using capacitively coupled NH{sub 3} plasma were very effective for modifying the properties of r-GO films for application as transparent conductive films.

A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Kim, Young-Cheol [Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791 (Korea, Republic of); Kim, Hyun-Jun; Lee, Hyo-Chang; Chung, Chin-Wook, E-mail: joykang@hanyang.ac.kr [Department of Electrical Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791 (Korea, Republic of)

2015-12-15

In a plasma discharge system, the power loss at powered line, matching network, and other transmission line can affect the discharge characteristics such as the power transfer efficiency, voltage and current at powered electrode, and plasma density. In this paper, we propose a method to reduce power loss by using a step down transformer mounted between the matching network and the powered electrode in a capacitively coupled argon plasma. This step down transformer decreases the power loss by reducing the current flowing through the matching network and transmission line. As a result, the power transfer efficiency was increased about 5%–10% by using a step down transformer. However, the plasma density was dramatically increased compared to no transformer. This can be understood by the increase in ohmic heating and the decrease in dc-self bias. By simply mounting a transformer, improvement of discharge efficiency can be achieved in capacitively coupled plasmas.

Chemical modeling of a high-density inductively-coupled plasma reactor containing silane

NARCIS (Netherlands)

Kovalgin, Alexeij Y.; Boogaard, A.; Brunets, I.; Holleman, J.; Schmitz, Jurriaan

We carried out the modeling of chemical reactions in a silane-containing remote Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICPECVD) system, intended for deposition of silicon, silicon oxide, and silicon nitride layers. The required electron densities and Electron Energy

Atomic and molecular processes in fusion plasmas

Energy Technology Data Exchange (ETDEWEB)

Janev, R.K. [International Atomic Energy Agency, Vienna (Austria)

1997-01-01

The role of atomic and molecular processes in achieving and maintaining the conditions for thermonuclear burn in a magnetically confined fusion plasma is described. Emphasis is given to the energy balance and power and particle exhaust issues. The most important atomic and molecular processes which affect the radiation losses and impurity transport in the core plasma, the neutral particle transport in the plasma edge and the radiative cooling of divertor plasmas are discussed in greater detail. (author)

Global (volume-averaged) model of inductively coupled chlorine plasma : influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas

NARCIS (Netherlands)

Kemaneci, E.H.; Carbone, E.A.D.; Booth, J.P.; Graef, W.A.A.D.; Dijk, van J.; Kroesen, G.M.W.

An inductively coupled radio-frequency plasma in chlorine is investigated via a global (volume-averaged) model, both in continuous and square wave modulated power input modes. After the power is switched off (in a pulsed mode) an ion–ion plasma appears. In order to model this phenomenon, a novel

New approach to the determination phosphorothioate oligonucleotides by ultra high performance liquid chromatography coupled with inductively coupled plasma mass spectrometry.

Science.gov (United States)

Studzińska, Sylwia; Mounicou, Sandra; Szpunar, Joanna; Łobiński, Ryszard; Buszewski, Bogusław

2015-01-15

This text presents a novel method for the separation and detection of phosphorothioate oligonucleotides with the use of ion pair ultra high performance liquid chromatography coupled with inductively coupled plasma mass spectrometry The research showed that hexafluoroisopropanol/triethylamine based mobile phases may be successfully used when liquid chromatography is coupled with such elemental detection. However, the concentration of both HFIP and TEA influences the final result. The lower concentration of HFIP, the lower the background in ICP-MS and the greater the sensitivity. The method applied for the analysis of serum samples was based on high resolution inductively coupled plasma mass spectrometry. Utilization of this method allows determination of fifty times lower quantity of phosphorothioate oligonucleotides than in the case of quadrupole mass analyzer. Monitoring of (31)P may be used to quantify these compounds at the level of 80 μg L(-1), while simultaneous determination of sulfur is very useful for qualitative analysis. Moreover, the results presented in this paper demonstrate the practical applicability of coupling LC with ICP-MS in determining phosphorothioate oligonucleotides and their metabolites in serum within 7 min with a very good sensitivity. The method was linear in the concentration range between 0.2 and 3 mg L(-1). The limit of detection was in the range of 0.07 and 0.13 mg L(-1). Accuracy varied with concentration, but was in the range of 3%. Copyright © 2014 Elsevier B.V. All rights reserved.

Numerical studies of independent control of electron density and gas temperature via nonlinear coupling in dual-frequency atmospheric pressure dielectric barrier discharge plasmas

International Nuclear Information System (INIS)

Zhang, Z. L.; Nie, Q. Y.; Wang, Z. B.; Gao, X. T.; Kong, F. R.; Sun, Y. F.; Jiang, B. H.

2016-01-01

Dielectric barrier discharges (DBDs) provide a promising technology of generating non-equilibrium cold plasmas in atmospheric pressure gases. For both application-focused and fundamental studies, it is important to explore the strategy and the mechanism for enabling effective independent tuning of key plasma parameters in a DBD system. In this paper, we report numerical studies of effects of dual-frequency excitation on atmospheric DBDs, and modulation as well as separate tuning mechanism, with emphasis on dual-frequency coupling to the key plasma parameters and discharge evolution. With an appropriately applied low frequency to the original high frequency, the numerical calculation demonstrates that a strong nonlinear coupling between two frequencies governs the process of ionization and energy deposition into plasma, and thus raises the electron density significantly (e.g., three times in this case) in comparisons with a single frequency driven DBD system. Nevertheless, the gas temperature, which is mainly determined by the high frequency discharge, barely changes. This method then enables a possible approach of controlling both averaged electron density and gas temperature independently.

Effect of electromagnetic waves and higher harmonics in capacitively coupled plasma phenomena

International Nuclear Information System (INIS)

Upadhyay, R R; Sawada, I; Ventzek, P L G; Raja, L L

2013-01-01

High-resolution self-consistent numerical simulation of electromagnetic wave phenomena in an axisymmetric capacitively coupled plasma reactor is reported. A prominent centre-peaked plasma density profile is observed for driving frequencies of 60 MHz and is consistent with observations in the literature and accompanying experimental studies. A power spectrum of the simulated wave electric field reveals the presence of well-resolved high frequency harmonic content up to the 20th harmonic of the excitation frequency; an observation that has also been reported in experiments. Importantly, the simulation results reveal that the occurrence of higher harmonics is strongly correlated with the occurrence of a centre-peaked plasma density profile. (fast track communication)

Plasma processing of superconducting radio frequency cavities

Science.gov (United States)

Upadhyay, Janardan

The development of plasma processing technology of superconducting radio frequency (SRF) cavities not only provides a chemical free and less expensive processing method, but also opens up the possibility for controlled modification of the inner surfaces of the cavity for better superconducting properties. The research was focused on the transition of plasma etching from two dimensional flat surfaces to inner surfaces of three dimensional (3D) structures. The results could be applicable to a variety of inner surfaces of 3D structures other than SRF cavities. Understanding the Ar/Cl2 plasma etching mechanism is crucial for achieving the desired modification of Nb SRF cavities. In the process of developing plasma etching technology, an apparatus was built and a method was developed to plasma etch a single cell Pill Box cavity. The plasma characterization was done with the help of optical emission spectroscopy. The Nb etch rate at various points of this cavity was measured before processing the SRF cavity. Cylindrical ring-type samples of Nb placed on the inner surface of the outer wall were used to measure the dependence of the process parameters on plasma etching. The measured etch rate dependence on the pressure, rf power, dc bias, temperature, Cl2 concentration and diameter of the inner electrode was determined. The etch rate mechanism was studied by varying the temperature of the outer wall, the dc bias on the inner electrode and gas conditions. In a coaxial plasma reactor, uniform plasma etching along the cylindrical structure is a challenging task due to depletion of the active radicals along the gas flow direction. The dependence of etch rate uniformity along the cylindrical axis was determined as a function of process parameters. The formation of dc self-biases due to surface area asymmetry in this type of plasma and its variation on the pressure, rf power and gas composition was measured. Enhancing the surface area of the inner electrode to reduce the

Micro- to macroscale perspectives on space plasmas

International Nuclear Information System (INIS)

Eastman, T.E.

1993-01-01

The Earth's magnetosphere is the most accessible of natural collisionless plasma environments; an astrophysical plasma ''laboratory.'' Magnetospheric physics has been in an exploration phase since its origin 35 years ago but new coordinated, multipoint observations, theory, modeling, and simulations are moving this highly interdisciplinary field of plasma science into a new phase of synthesis and understanding. Plasma systems are ones in which binary collisions are relatively negligible and collective behavior beyond the microscale emerges. Most readily accessible natural plasma systems are collisional and nearest-neighbor classical interactions compete with longer-range plasma effects. Except for stars, most space plasmas are collisionless, however, and the effects of electrodynamic coupling dominate. Basic physical processes in such collisionless plasmas occur at micro-, meso-, and macroscales that are not merely reducible to each other in certain crucial ways as illustrated for the global coupling of the Earth's magnetosphere and for the nonlinear dynamics of charged particle motion in the magnetotail. Such global coupling and coherence makes the geospace environment, the domain of solar-terrestrial science, the most highly coupled of all physical geospheres

Inductively coupled plasma source mass spectrometry

International Nuclear Information System (INIS)

Price Russ, G. III

1993-01-01

Inductively coupled plasma source mass spectrometry (ICP-MS) is a relatively new (5 y commercial availability) technique for simultaneously determining the concentration and isotopic composition of a large number of elements at trace levels. The principle advantages of ICP-MS are the ability to measure essentially all the metallic elements at concentrations as low as 1 part in 10 12 by weight, to analyse aqueous samples directly, to determine the isotopic composition of essentially all the metallic elements, and to analyse samples rapidly (minutes). The history of the development of ICP-MS and discussions of a variety of applications have been discussed in detail in Date and Gray (1988). Koppenaal (1988, 1990) has reviewed the ICP-MS literature. In that ICP-MS is a relatively new and still evolving technique, this chapter will discuss potential capability more than proven performance. (author). 24 refs

Pulsed high-density plasmas for advanced dry etching processes

International Nuclear Information System (INIS)

Banna, Samer; Agarwal, Ankur; Cunge, Gilles; Darnon, Maxime; Pargon, Erwine; Joubert, Olivier

2012-01-01

Plasma etching processes at the 22 nm technology node and below will have to satisfy multiple stringent scaling requirements of microelectronics fabrication. To satisfy these requirements simultaneously, significant improvements in controlling key plasma parameters are essential. Pulsed plasmas exhibit considerable potential to meet the majority of the scaling challenges, while leveraging the broad expertise developed over the years in conventional continuous wave plasma processing. Comprehending the underlying physics and etching mechanisms in pulsed plasma operation is, however, a complex undertaking; hence the full potential of this strategy has not yet been realized. In this review paper, we first address the general potential of pulsed plasmas for plasma etching processes followed by the dynamics of pulsed plasmas in conventional high-density plasma reactors. The authors reviewed more than 30 years of academic research on pulsed plasmas for microelectronics processing, primarily for silicon and conductor etch applications, highlighting the potential benefits to date and challenges in extending the technology for mass-production. Schemes such as source pulsing, bias pulsing, synchronous pulsing, and others in conventional high-density plasma reactors used in the semiconductor industry have demonstrated greater flexibility in controlling critical plasma parameters such as ion and radical densities, ion energies, and electron temperature. Specifically, plasma pulsing allows for independent control of ion flux and neutral radicals flux to the wafer, which is key to eliminating several feature profile distortions at the nanometer scale. However, such flexibility might also introduce some difficulty in developing new etching processes based on pulsed plasmas. Therefore, the main characteristics of continuous wave plasmas and different pulsing schemes are compared to provide guidelines for implementing different schemes in advanced plasma etching processes based on

InAs0.45P0.55/InP strained multiple quantum wells intermixed by inductively coupled plasma etching

International Nuclear Information System (INIS)

Cao, Meng; Wu, Hui-Zhen; Lao, Yan-Feng; Cao, Chun-Fang; Liu, Cheng

2009-01-01

The intermixing effect on InAs 0.45 P 0.55 /InP strained multiple quantum wells (SMQWs) by inductively coupled plasma (ICP) etching and rapid thermal annealing (RTA) is investigated. Experiments show that the process of ICP etching followed RTA induces the blue shift of low temperature photoluminescence (PL) peaks of QWs. With increasing etching depth, the PL intensities are firstly enhanced and then diminished. This phenomenon is attributed to the variation of surface roughness and microstructure transformation inside the QW structure during ICP processing.

Interfacing capillary electrophoresis with inductively coupled plasma mass spectrometry by direct injection nebulization for selenium speciation

DEFF Research Database (Denmark)

Bendahl, Lars; Gammelgaard, Bente; Jons, O.

2001-01-01

A demountable direct injection high efficiency nebulizer operating at low sample uptake rates was developed and used for coupling of capillary electrophoresis (CE) with inductively coupled plasma mass spectrometry (ICP-MS). When the nebulizer was used for continuous sample introduction, detection...

Simulation of spatially dependent excitation rates and power deposition in RF discharges for plasma processing

International Nuclear Information System (INIS)

Kushner, M.J.; Anderson, H.M.; Hargis, P.J.

1985-01-01

In low pressure, radio frequency (RF) discharges of the type used in plasma processing of semiconductor materials, the rate of electron impact excitation and energy transfer processes depends upon both the phase of the RF excitation and position in the discharge. Electron impact collisions create radicals that diffuse or drift to the surfaces of interest where they are adsorbed or otherwise react. To the extent that these radicals have a finite lifetime, their transport time from point of creation to surface of interest is an important parameter. The spatial dependence of the rate of the initial electron impact collisions is therefore also an important parameter. The power that sustains the discharge is coupled into the system by two mechanisms: a high energy e-beam component of the electron distribution resulting from electrons falling through or being accelerated by the sheaths, and by joule heating in the body of the plasma. In this paper, the authors discuss the spatial dependence of excitation rates and the method of power deposition iin RF discharges of the type used for plasma processing

Improvement of NiMoNb to polyimide adhesion by inductively coupled nitrogen plasma treatment

Energy Technology Data Exchange (ETDEWEB)

Bang, S.-H., E-mail: zxclucy@snu.ac.kr

2016-01-01

Graphical abstract: - Highlights: • NiMoNb was introduced as the adhesion layer for flexible Cu-clad laminate structure. • The effect of sputtering and plasma power on the peel strength was studied. • Plasma pretreatment in inductively coupled plasma greatly affects the peel strength. • FCCL with NiMoNb adhesion layer show outstanding peel strength. - Abstract: In this study, the effect of sputtering power on the peel strength of the flexible copper clad laminate (FCCL) was evaluated before and after heat treatment using 180° peel test. An increase in the sputtering powers from 200 W to 600 W increased film density and improved peel strength. To enhance peel strength much more, an inductively coupled plasma (ICP) was treated on the PI surface using N{sub 2} gas with Ar as a function of RF power. A dramatic enhancement of the peel strength, 923 N/m was achieved, especially after heat treatment by changing ICP power from 200 W to 900 W. The reduction ratio of the peel strength for the 900 W plasma-treated FCCL was only 12%, whereas that for the 200 W plasma-treated FCCL was 43%. The root mean square (RMS) surface roughness with PIs exposed to both 200 W and 900 W plasma treatments was rarely changed, while X-ray photoelectron spectroscopy (XPS) showed the substantial increase of C–N functional groups. To obtain insight the film characteristics, the NiMoNb/PI interfaces were investigated by a high resolution transmission electron microscopy (HR-TEM).

Stable explicit coupling of the Yee scheme with a linear current model in fluctuating magnetized plasmas

International Nuclear Information System (INIS)

Silva, Filipe da; Pinto, Martin Campos; Després, Bruno; Heuraux, Stéphane

2015-01-01

This work analyzes the stability of the Yee scheme for non-stationary Maxwell's equations coupled with a linear current model with density fluctuations. We show that the usual procedure may yield unstable scheme for physical situations that correspond to strongly magnetized plasmas in X-mode (TE) polarization. We propose to use first order clustered discretization of the vectorial product that gives back a stable coupling. We validate the schemes on some test cases representative of direct numerical simulations of X-mode in a magnetic fusion plasma including turbulence

Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: II. Radial uniformity of the plasma characteristics

International Nuclear Information System (INIS)

Zhang Yuru; Xu Xiang; Wang Younian; Bogaerts, Annemie

2012-01-01

A two-dimensional fluid model, including the full set of Maxwell equations, has been developed and applied to investigate the effect of a phase shift between two power sources on the radial uniformity of several plasma characteristics in a hydrogen capacitively coupled plasma. This study was carried out at various frequencies in the range 13.56-200 MHz. When the frequency is low, at 13.56 MHz, the plasma density is characterized by an off-axis peak when both power sources are in-phase (φ = 0), and the best radial uniformity is obtained at φ = π. This trend can be explained because the radial nonuniformity caused by the electrostatic edge effect can be effectively suppressed by the phase-shift effect at a phase difference equal to π. When the frequency rises to 60 MHz, the plasma density profiles shift smoothly from edge-peaked over uniform to centre-peaked as the phase difference increases, due to the pronounced standing-wave effect, and the best radial uniformity is reached at φ = 0.3π. At a frequency of 100 MHz, a similar behaviour is observed, except that the maximum of the plasma density moves again towards the radial edge at the reverse-phase case (φ = π), because of the dominant skin effect. When the frequency is 200 MHz, the bulk plasma density increases significantly with increasing phase-shift values, and a better uniformity is obtained at φ = 0.4π. This is because the density in the centre increases faster than at the radial edge as the phase difference rises, due to the increasing power deposition P z in the centre and the decreasing power density P r at the radial edge. As the phase difference increases to π, the maximum near the radial edge becomes obvious again. This is because the skin effect has a predominant influence on the plasma density under this condition, resulting in a high density at the radial edge. Moreover, the axial ion flux increases monotonically with phase difference, and exhibits similar profiles to the plasma density

Line photon transport in a non-homogeneous plasma using radiative coupling coefficients

International Nuclear Information System (INIS)

Florido, R.; Gil, J.M.; Rodriguez, R.; Rubiano, J.G.; Martel, P.; Florido, R.; Gil, J.M.; Rodriguez, R.; Rubiano, J.G.; Martel, P.; Minguez, E.

2006-01-01

We present a steady-state collisional-radiative model for the calculation of level populations in non-homogeneous plasmas with planar geometry. The line photon transport is taken into account following an angle- and frequency-averaged escape probability model. Several models where the same approach has been used can be found in the literature, but the main difference between our model and those ones is that the details of geometry are exactly treated in the definition of coupling coefficients and a local profile is taken into account in each plasma cell. (authors)

Automated Plasma Spray (APS) process feasibility study: Plasma spray process development and evaluation

Science.gov (United States)

Fetheroff, C. W.; Derkacs, T.; Matay, I. M.

1979-01-01

An automated plasma spray (APS) process was developed to apply two layer (NiCrAlY and ZrO2-12Y2O3) thermal-barrier coatings to aircraft gas turbine engine blade airfoils. The APS process hardware consists of four subsystems: a mechanical blade positioner incorporating two interlaced six-degree-of-freedom assemblies; a noncoherent optical metrology subsystem; a microprocessor-based adaptive system controller; and commercial plasma spray equipment. Over fifty JT9D first stage turbine blades specimens were coated with the APS process in preliminary checkout and evaluation studies. The best of the preliminary specimens achieved an overall coating thickness uniformity of + or - 53 micrometers, much better than is achievable manually. Factors limiting this performance were identified and process modifications were initiated accordingly. Comparative evaluations of coating thickness uniformity for manually sprayed and APS coated specimens were initiated. One of the preliminary evaluation specimens was subjected to a torch test and metallographic evaluation.

Simulation of the electric potential and plasma generation coupling in magnetron sputtering discharges

Science.gov (United States)

Trieschmann, Jan; Krueger, Dennis; Schmidt, Frederik; Brinkmann, Ralf Peter; Mussenbrock, Thomas

2016-09-01

Magnetron sputtering typically operated at low pressures below 1 Pa is a widely applied deposition technique. For both, high power impulse magnetron sputtering (HiPIMS) as well as direct current magnetron sputtering (dcMS) the phenomenon of rotating ionization zones (also referred to as spokes) has been observed. A distinct spatial profile of the electric potential has been associated with the latter, giving rise to low, mid, and high energy groups of ions observed at the substrate. The adherent question of which mechanism drives this process is still not fully understood. This query is approached using Monte Carlo simulations of the heavy particle (i.e., ions and neutrals) transport consistently coupled to a pre-specified electron density profile via the intrinsic electric field. The coupling between the plasma generation and the electric potential, which establishes correspondingly, is investigated. While the system is observed to strive towards quasi-neutrality, distinct mechanisms governing the shape of the electric potential profile are identified. This work is supported by the German Research Foundation (DFG) in the frame of the transregional collaborative research centre TRR 87.

Radiant-and-plasma technology for coal processing

Directory of Open Access Journals (Sweden)

Vladimir Messerle

2012-12-01

Full Text Available Radiant-and-plasma technology for coal processing is presented in the article. Thermodynamic computation and experiments on plasma processing of bituminous coal preliminary electron-beam activated were fulfilled in comparison with plasma processing of the coal. Positive influence of the preliminary electron-beam activation of coal on synthesis gas yield was found. Experiments were carried out in the plasma gasifier of 100 kW power. As a result of the measurements of material and heat balance of the process gave the following integral indicators: weight-average temperature of 2200-2300 K, and carbon gasification degree of 82,4-83,2%. Synthesis gas yield at thermochemical preparation of raw coal dust for burning was 24,5% and in the case of electron-beam activation of coal synthesis gas yield reached 36,4%, which is 48% higher.

Sterilization of beehive material with a double inductively coupled low pressure plasma

International Nuclear Information System (INIS)

Priehn, M; Leichert, L I; Denis, B; Awakowicz, P; Aumeier, P; Kirchner, W H

2016-01-01

American Foulbrood is a severe, notifiable disease of the honey bee. It is caused by infection of bee larvae with spores of the gram-positive bacterium Paenibacillus larvae . Spores of this organism are found in high numbers in an infected hive and are highly resistant to physical and chemical inactivation methods. The procedures to rehabilitate affected apiaries often result in the destruction of beehive material. In this study we assess the suitability of a double inductively coupled low pressure plasma as a non-destructive, yet effective alternative inactivation method for bacterial spores of the model organism Bacillus subtilis on beehive material. Plasma treatment was able to effectively remove spores from wax, which, under protocols currently established in veterinary practice, normally is destroyed by ignition or autoclaved for sterilization. Spores were removed from wooden surfaces with efficacies significantly higher than methods currently used in veterinary practice, such as scorching by flame treatment. In addition, we were able to non-destructively remove spores from the highly delicate honeycomb wax structures, potentially making treatment of beehive material with double inductively coupled low pressure plasma part of a fast and reliable method to rehabilitate infected bee colonies with the potential to re-use honeycombs. (paper)

Plasma Processing of Model Residential Solid Waste

Science.gov (United States)

Messerle, V. E.; Mossé, A. L.; Nikonchuk, A. N.; Ustimenko, A. B.; Baimuldin, R. V.

2017-09-01

The authors have tested the technology of processing of model residential solid waste. They have developed and created a pilot plasma unit based on a plasma chamber incinerator. The waste processing technology has been tested and prepared for commercialization.

On improved understanding of plasma-chemical processes in complex low-temperature plasmas

Science.gov (United States)

Röpcke, Jürgen; Loffhagen, Detlef; von Wahl, Eric; Nave, Andy S. C.; Hamann, Stephan; van Helden, Jean-Piere H.; Lang, Norbert; Kersten, Holger

2018-05-01

Over the last years, chemical sensing using optical emission spectroscopy (OES) in the visible spectral range has been combined with methods of mid infrared laser absorption spectroscopy (MIR-LAS) in the molecular fingerprint region from 3 to 20 μm, which contains strong rotational-vibrational absorption bands of a large variety of gaseous species. This optical approach established powerful in situ diagnostic tools to study plasma-chemical processes of complex low-temperature plasmas. The methods of MIR-LAS enable to detect stable and transient molecular species in ground and excited states and to measure the concentrations and temperatures of reactive species in plasmas. Since kinetic processes are inherent to discharges ignited in molecular gases, high time resolution on sub-second timescales is frequently desired for fundamental studies as well as for process monitoring in applied research and industry. In addition to high sensitivity and good temporal resolution, the capacity for broad spectral coverage enabling multicomponent detection is further expanding the use of OES and MIR-LAS techniques. Based on selected examples, this paper reports on recent achievements in the understanding of complex low-temperature plasmas. Recently, a link with chemical modeling of the plasma has been provided, which is the ultimate objective for a better understanding of the chemical and reaction kinetic processes occurring in the plasma. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

Thin TiO2 films deposited by implantation and sputtering in RF inductively coupled plasmas

International Nuclear Information System (INIS)

Valencia-Alvarado, R; López-Callejas, R; Barocio, S R; Mercado-Cabrera, A; Peña-Eguiluz, R; Muñoz-Castro, A E; Rodríguez-Méndez, B G; De la Piedad-Beneitez, A; De la Rosa-Vázquez, J M

2012-01-01

The achievement of titanium dioxide (TiO 2 ) thin films in the rutile crystalline phase is reported. The samples result from the implantation of oxygen ions of Ti in argon/oxygen plasma generated by inductively coupled RF at a commercial 13.56 MHz frequency. Simultaneously, a sputtering process is conducted on the titanium target in order to produce TiO 2 thin films in the anatase phase over silicon and glass substrates. Both implantation and sputtering processes shared the same 500 W plasma with the target, polarized between 0 and -3 kV. The substrates were placed between 2 and 3 cm from the target, this distance being found to be determinant of the TiO 2 deposition rate. The rutile phase in the target was obtained at temperatures in the order of 680 degrees C and the anatase (unbiased) one at about 300 degrees C without any auxiliary heating. The crystalline phases were characterized by x ray diffraction and Raman spectroscopy. The morphology and average roughness were established by means of scanning electronic and atomic force microscopy, whereas the reaction products generated during the oxidation process were analyzed by mass spectrometry. Finally, the stoichiometric composition was measured by means of X-ray photoelectron spectroscopy.

16. Hot dense plasma atomic processes

International Nuclear Information System (INIS)

Werner, Dappen; Totsuji, H.; Nishii, Y.

2002-01-01

This document gathers 13 articles whose common feature is to deal with atomic processes in hot plasmas. Density functional molecular dynamics method is applied to the hydrogen plasma in the domain of liquid metallic hydrogen. The effects of the density gradient are taken into account in both the electronic kinetic energy and the exchange energy and it is shown that they almost cancel with each other, extending the applicability of the Thomas-Fermi-Dirac approximation to the cases where the density gradient is not negligible. Another article reports about space and time resolved M-shell X-ray measurements of a laser-produced gas jet xenon plasma. Plasma parameters have been measured by ion acoustic and electron plasma waves Thomson scattering. Photo-ionization becomes a dominant atomic process when the density and the temperature of plasmas are relatively low and when the plasma is submitted to intense external radiation. It is shown that 2 plasmas which have a very different density but have the same ionization parameters, are found in a similar ionization state. Most radiation hydrodynamics codes use radiative opacity data from available libraries of atomic data. Several articles are focused on the determination of one group Rosseland and Planck mean analytical formulas for several single elements used in inertial fusion targets. In another paper the plasma density effect on population densities, effective ionization, recombination rate coefficients and on emission lines from carbon and Al ions in hot dense plasma, is studied. The last article is devoted to a new atomic model in plasmas that considers the occupation probability of the bound state and free state density in the presence of the plasma micro-field. (A.C.)

Battery-powered pulsed high density inductively coupled plasma source for pre-ionization in laboratory astrophysics experiments.

Science.gov (United States)

Chaplin, Vernon H; Bellan, Paul M

2015-07-01

An electrically floating radiofrequency (RF) pre-ionization plasma source has been developed to enable neutral gas breakdown at lower pressures and to access new experimental regimes in the Caltech laboratory astrophysics experiments. The source uses a customized 13.56 MHz class D RF power amplifier that is powered by AA batteries, allowing it to safely float at 3-6 kV with the electrodes of the high voltage pulsed power experiments. The amplifier, which is capable of 3 kW output power in pulsed (<1 ms) operation, couples electrical energy to the plasma through an antenna external to the 1.1 cm radius discharge tube. By comparing the predictions of a global equilibrium discharge model with the measured scalings of plasma density with RF power input and axial magnetic field strength, we demonstrate that inductive coupling (rather than capacitive coupling or wave damping) is the dominant energy transfer mechanism. Peak ion densities exceeding 5 × 10(19) m(-3) in argon gas at 30 mTorr have been achieved with and without a background field. Installation of the pre-ionization source on a magnetohydrodynamically driven jet experiment reduced the breakdown time and jitter and allowed for the creation of hotter, faster argon plasma jets than was previously possible.

Initial design for an experimental investigation of strongly coupled plasma behavior in the ATLAS facility

CERN Document Server

Munson, C P; Taylor, A J; Trainor, R J; Wood, B P; Wysocki, F J

1999-01-01

Summary form only given. Atlas is a high current (~30 MA peak, with a current risetime ~4.5 mu sec), high energy (E/sub stored/=24 MJ, E /sub load/=3-6 MJ), pulsed power facility which is being constructed at Los Alamos National Laboratory with a scheduled completion date in the year 2000. When operational, this facility will provide a platform for experiments in high pressure shocks (>20 Mbar), adiabatic compression ( rho / rho /sub 0/>5, P>10 Mbar), high magnetic fields (~2000 T), high strain and strain rates ( epsilon >200, d epsilon /dt~10/sup 4/ to 10/sup 6/ s/sup -1/), hydrodynamic instabilities of materials in turbulent regimes, magnetized target fusion, equation of state, and strongly coupled plasmas. For the strongly coupled plasma experiments, an auxiliary capacitor bank will be used to generate a moderate density (<0.1 solid), relatively cold (~1 eV) plasma by ohmic heating of a conducting material of interest such as titanium. This target plasma will be compressed against a central column conta...

Atlas of atomic spectral lines of plutonium emitted by an inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

Edelson, M.C.; DeKalb, E.L.; Winge, R.K.; Fassel, V.A.

1986-09-01

Optical emission spectra from high-purity Pu-242 were generated with a glovebox-enclosed inductively coupled plasma (ICP) source. Spectra covering the 2280 to 7008 Angstrom wavelength range are presented along with general commentary on ICP-Pu spectroscopy.

Radio frequency energy coupling to high-pressure optically pumped nonequilibrium plasmas

International Nuclear Information System (INIS)

Plonjes, Elke; Palm, Peter; Lee, Wonchul; Lempert, Walter R.; Adamovich, Igor V.

2001-01-01

This article presents an experimental demonstration of a high-pressure unconditionally stable nonequilibrium molecular plasma sustained by a combination of a continuous wave CO laser and a sub-breakdown radio frequency (rf) electric field. The plasma is sustained in a CO/N 2 mixture containing trace amounts of NO or O 2 at pressures of P=0.4 - 1.2atm. The initial ionization of the gases is produced by an associative ionization mechanism in collisions of two CO molecules excited to high vibrational levels by resonance absorption of the CO laser radiation with subsequent vibration-vibration (V-V) pumping. Further vibrational excitation of both CO and N 2 is produced by free electrons heated by the applied rf field, which in turn produces additional ionization of these species by the associative ionization mechanism. In the present experiments, the reduced electric field, E/N, is sufficiently low to preclude field-induced electron impact ionization. Unconditional stability of the resultant cold molecular plasma is enabled by the negative feedback between gas heating and the associative ionization rate. Trace amounts of nitric oxide or oxygen added to the baseline CO/N 2 gas mixture considerably reduce the electron - ion dissociative recombination rate and thereby significantly increase the initial electron density. This allows triggering of the rf power coupling to the vibrational energy modes of the gas mixture. Vibrational level populations of CO and N 2 are monitored by infrared emission spectroscopy and spontaneous Raman spectroscopy. The experiments demonstrate that the use of a sub-breakdown rf field in addition to the CO laser allows an increase of the plasma volume by about an order of magnitude. Also, CO infrared emission spectra show that with the rf voltage turned on the number of vibrationally excited CO molecules along the line of sight increase by a factor of 3 - 7. Finally, spontaneous Raman spectra of N 2 show that with the rf voltage the vibrational

Separation and analysis of lanthanides by isotachophoresis coupled with inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Vio, Laurent; Cretier, Gerard; Rocca, Jean-Louis; Chartier, Frederic; Geertsen, Valerie; Gourgiotis, Alkiviadis; Isnard, Helene

2012-01-01

This study is a large project initiated by the French Nuclear Agency, and concerns the development of a new electrolyte system for the separation of lanthanides by isotachophoresis. This new system is based on a leading electrolyte that incorporates 2-hydroxy-2-methylbutyric acid as complexing agent. The optimization of separation conditions (complexing agent concentration, pH, capillary dimensions, injection conditions, and current intensity) performed by experiments on a commercial capillary instrument with contactless conductivity detection, which allows to improve the separation of 13 lanthanides (La to Lu, except Pm and Ho). We have also directly coupled the isotachophoresis to an inductively coupled plasma mass spectrometer to visualize the mono-elementary elution bands and demonstrate the potentiality of the method for isotope ratio measurements. The application to a simulated solution representative of a fraction of fission products present in a MOX spent fuel is presented in this paper to demonstrate the possible application in future on nuclear fuel samples. (authors)

Ion-pair chromatography coupled to inductively coupled plasma-mass spectrometry (IPC-ICP-MS) as a method for thiomolybdate speciation in natural waters.

Science.gov (United States)

Lohmayer, Regina; Reithmaier, Gloria Maria Susanne; Bura-Nakić, Elvira; Planer-Friedrich, Britta

2015-03-17

Molybdenum precipitates preferentially under reducing conditions; therefore, its occurrence in sediment records is used as an indicator of paleoredox conditions. Although thiomolybdates (MoO4-xSx(2-) with x = 1-4) supposedly are necessary intermediates in the process of molybdenum precipitation under anoxic conditions, there is no information about their abundance in natural environments, because of a lack of element-specific methods with sufficiently low detection limits. Here, we optimized ion-pair chromatographic separation for coupling to an inductively coupled plasma-mass spectrometry detector (IPC-ICP-MS). 2-Propanol (10%-25% gradient) replaced the previously used acetonitrile (25%-75%) as the solvent, to reduce the carbon load into the plasma. In synthetic solutions, formation of thiomolybdates was found to occur spontaneously in the presence of excess sulfide and the degree of thiolation was highest at pH 7. Excess hydroxyl led to a transformation of thiomolybdates to molybdate. Under acidic to neutral conditions, precipitation of molybdenum and hydrolysis of tetrathiomolybdate were observed. Flash-freezing was found to be suitable to stabilize tetrathiomolybdate, with 2 mM) negatively affected the detection of molybdate, which eluted mainly in the dead volume, but had no negative effect on higher thiolated molybdates. Detection limits were ∼10 nM. With the newly developed IPC-ICP-MS method, thiomolybdates were found to form spontaneously in euxinic marine waters after adding a molybdate spike and occur naturally in sulfidic geothermal waters.

Transport processes in space plasmas

International Nuclear Information System (INIS)

Birn, J.; Elphic, R.C.; Feldman, W.C.

1997-01-01

This is the final report of a three-year, Laboratory Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). The project represents a comprehensive research effort to study plasma and field transport processes relevant for solar-terrestrial interaction, involving the solar wind and imbedded magnetic field and plasma structures, the bow shock of the Earth's magnetosphere and associated waves, the Earth's magnetopause with imbedded flux rope structures and their connection with the Earth, plasma flow in the Earth's magnetotail, and ionospheric beam/wave interactions. The focus of the work was on the interaction between plasma and magnetic and electric fields in the regions where different plasma populations exist adjacent to or superposed on each other. These are the regions of particularly dynamic plasma behavior, important for plasma and energy transport and rapid energy releases. The research addressed questions about how this interaction takes place, what waves, instabilities, and particle/field interactions are involved, how the penetration of plasma and energy through characteristic boundaries takes place, and how the characteristic properties of the plasmas and fields of the different populations influence each other on different spatial and temporal scales. These topics were investigated through combining efforts in the analysis of plasma and field data obtained through space missions with theory and computer simulations of the plasma behavior

Surface properties of indium tin oxide treated by Cl2 inductively coupled plasma

International Nuclear Information System (INIS)

He, Kongduo; Yang, Xilu; Yan, Hang; Gong, Junyi; Zhong, Shaofeng; Ou, Qiongrong; Liang, Rongqing

2014-01-01

Graphical abstract: - Highlights: • The work function of chlorinated ITO increases initially by up to 1 eV. • The chlorinated ITO keeps an increment of work function of 0.3 eV after 100 days. • The WF decrease curves can be fitted with double exponential functions. • The desorption of unstable Cl in the surface leads to the rapid decrease of WF. • The core levels of In 3d5 and Sn 3d5 and O 1s shift toward higher binding energies. - Abstract: The effects of Cl 2 inductively coupled plasma (ICP) treatment on the time dependence of work function (WF) and surface properties of indium tin oxide (ITO) were investigated. Kelvin probe (KP) measurements show that the WF after Cl 2 ICP treatment is close to 5.9 eV. The WF decrease curve of Cl 2 plasma treated ITO is fitted with double exponential functions with an adjusted R-square of 0.99. The mechanism under the decrease process is discussed by X-ray photoelectron spectroscopy (XPS). The ITO WF decrease after Cl 2 ICP treatment performs much better than that after O 2 ICP treatment and the chlorinated ITO keeps a WF increment of 0.3 eV compared with that without plasma treatment after 100 days. Other properties of chlorinated ITO surface such as morphology and transmittance change slightly. The results are significant for the understanding of degradation of Cl 2 plasma treated ITO and the fabrication of organic semiconductor devices

Non-equilibrium plasma reactor for natrual gas processing

International Nuclear Information System (INIS)

Shair, F.H.; Ravimohan, A.L.

1974-01-01

A non-equilibrium plasma reactor for natural gas processing into ethane and ethylene comprising means of producing a non-equilibrium chemical plasma wherein selective conversion of the methane in natural gas to desired products of ethane and ethylene at a pre-determined ethane/ethylene ratio in the chemical process may be intimately controlled and optimized at a high electrical power efficiency rate by mixing with a recycling gas inert to the chemical process such as argon, helium, or hydrogen, reducing the residence time of the methane in the chemical plasma, selecting the gas pressure in the chemical plasma from a wide range of pressures, and utilizing pulsed electrical discharge producing the chemical plasma. (author)

Quantum screening effects on the electron-ion occurrence scattering time advance in strongly coupled semiclassical plasmas

International Nuclear Information System (INIS)

Song, Mi-Young; Jung, Young-Dae

2003-01-01

Quantum screening effects on the occurrence scattering time advance for elastic electron-ion collisions in strongly coupled semiclassical plasmas are investigated using the second-order eikonal analysis. The electron-ion interaction in strongly coupled semiclassical plasmas is obtained by the pseudopotential model taking into account the plasma screening and quantum effects. It is found that the quantum-mechanical effects significantly reduce the occurrence scattering time advance. It is also found that the occurrence scattering time advance increases with increasing Debye length. It is quite interesting to note that the domain of the maximum occurrence time advance is localized for the forward scattering case. The region of the scaled thermal de Broglie wave length (λ-bar) for the maximum occurrence time advance is found to be 0.4≤λ-bar≤1.4

Fundamental atomic plasma chemistry for semiconductor manufacturing process analysis

International Nuclear Information System (INIS)

Ventzek, P.L.G.; Zhang, D.; Stout, P.J.; Rauf, S.; Orlowski, M.; Kudrya, V.; Astapenko, V.; Eletskii, A.

2002-01-01

An absence of fundamental atomic plasma chemistry data (e.g. electron impact cross-sections) hinders the application of plasma process models in semiconductor manufacturing. Of particular importance is excited state plasma chemistry data for metallization applications. This paper describes important plasma chemistry processes in the context of high density plasmas for metallization application and methods for the calculation of data for the study of these processes. Also discussed is the development of model data sets that address computational tractability issues. Examples of model electron impact cross-sections for Ni reduced from multiple collision processes are presented

Assessment of high precision, high accuracy Inductively Coupled Plasma-Optical Emission Spectroscopy to obtain concentration uncertainties less than 0.2% with variable matrix concentrations

International Nuclear Information System (INIS)

Rabb, Savelas A.; Olesik, John W.

2008-01-01

The ability to obtain high precision, high accuracy measurements in samples with complex matrices using High Performance Inductively Coupled Plasma-Optical Emission Spectroscopy (HP-ICP-OES) was investigated. The Common Analyte Internal Standard (CAIS) procedure was incorporated into the High Performance Inductively Coupled Plasma-Optical Emission Spectroscopy method to correct for matrix-induced changes in emission intensity ratios. Matrix matching and standard addition approaches to minimize matrix-induced errors when using High Performance Inductively Coupled Plasma-Optical Emission Spectroscopy were also assessed. The High Performance Inductively Coupled Plasma-Optical Emission Spectroscopy method was tested with synthetic solutions in a variety of matrices, alloy standard reference materials and geological reference materials

Some new radiation processes in plasmas

International Nuclear Information System (INIS)

Wu, C.S.

1981-01-01

Some new plasma radiation processes are reviewed, viz., (1) emission near the electron plasma frequency, (2) direct amplification of radiation near the electron cycloton frequency, and (3) parametic amplification of radiation by stimulated scattering. (L.C.) [pt

Surface studies of plasma processed Nb samples

International Nuclear Information System (INIS)

Tyagi, Puneet V.; Doleans, Marc; Hannah, Brian S.; Afanador, Ralph; Stewart, Stephen; Mammosser, John; Howell, Matthew P; Saunders, Jeffrey W; Degraff, Brian D; Kim, Sang-Ho

2015-01-01

Contaminants present at top surface of superconducting radio frequency (SRF) cavities can act as field emitters and restrict the cavity accelerating gradient. A room temperature in-situ plasma processing technology for SRF cavities aiming to clean hydrocarbons from inner surface of cavities has been recently developed at the Spallation Neutron Source (SNS). Surface studies of the plasma-processed Nb samples by Secondary ion mass spectrometry (SIMS) and Scanning Kelvin Probe (SKP) showed that the NeO_2 plasma processing is very effective to remove carbonaceous contaminants from top surface and improves the surface work function by 0.5 to 1.0 eV.

Determination of trace elements in petroleum products by inductively coupled plasma techniques: A critical review

International Nuclear Information System (INIS)

Sánchez, Raquel; Todolí, José Luis; Lienemann, Charles-Philippe; Mermet, Jean-Michel

2013-01-01

The fundamentals, applications and latter developments of petroleum products analysis through inductively coupled plasma optical emission spectrometry (ICP-OES) and mass spectrometry (ICP-MS) are revisited in the present bibliographic survey. Sample preparation procedures for the direct analysis of fuels by using liquid sample introduction systems are critically reviewed and compared. The most employed methods are sample dilution, emulsion or micro-emulsion preparation and sample decomposition. The first one is the most widely employed due to its simplicity. Once the sample has been prepared, an organic matrix is usually present. The performance of the sample introduction system (i.e., nebulizer and spray chamber) depends strongly upon the nature and properties of the solution finally obtained. Many different devices have been assayed and the obtained results are shown. Additionally, samples can be introduced into the plasma by using an electrothermal vaporization (ETV) device or a laser ablation system (LA). The recent results published in the literature showing the feasibility, advantages and drawbacks of latter alternatives are also described. Therefore, the main goal of the review is the discussion of the different approaches developed for the analysis of crude oil and its derivates by inductively coupled plasma (ICP) techniques. - Highlights: • Analysis of petroleum products by inductively coupled plasma techniques is revisited. • Fundamental studies are included together with reports dealing with applications. • Conventional and non-conventional sample introduction methods are considered. • Sample preparation methods are critically compared and described

Room temperature inductively coupled plasma etching of InAs/InSb in BCl 3/Cl 2/Ar

KAUST Repository

Sun, Jian; Kosel, Jü rgen

2012-01-01

Inductively coupled plasma (ICP) etching of InAs and InSb at room temperature has been investigated using BCl 3/Cl 2/Ar plasma. Specifically, the etch rate and post-etching surface morphology were investigated as functions of the gas composition

Flow injection analysis in inductively coupled plasma spectrometry

International Nuclear Information System (INIS)

Rosias, Maria F.G.G.

1995-10-01

The main features of flow injection analysis (FIA) as contribution to the inductively coupled plasma (Icp) spectrometry are described. A systematic review of researches using the combined FIA-Icp and the benefits of this association are presented. Flow systems were proposed to perform on-line Icp solution management for multielemental determination by atomic emission spectrometry (Icp-AES) or mass spectrometry. The inclusion of on-line ion exchangers in flow systems for matrix separation and/or analyte preconcentration are presented. Together with those applications the new advent of instruments with facilities for multielement detection on flow injection signals are described. (author). 75 refs., 19 figs

Drag force in a strongly coupled anisotropic plasma

Science.gov (United States)

Chernicoff, Mariano; Fernández, Daniel; Mateos, David; Trancanelli, Diego

2012-08-01

We calculate the drag force experienced by an infinitely massive quark propagating at constant velocity through an anisotropic, strongly coupled {N} = 4 plasma by means of its gravity dual. We find that the gluon cloud trailing behind the quark is generally misaligned with the quark velocity, and that the latter is also misaligned with the force. The drag coefficient μ can be larger or smaller than the corresponding isotropic value depending on the velocity and the direction of motion. In the ultra-relativistic limit we find that generically μ ∝ p. We discuss the conditions under which this behaviour may extend to more general situations.

Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges

International Nuclear Information System (INIS)

Kushner, Mark J.

2003-01-01

Magnetically enhanced capacitively coupled plasma sources use transverse static magnetic fields to modify the performance of low pressure radio frequency discharges. Magnetically enhanced reactive ion etching (MERIE) sources typically use magnetic fields of tens to hundreds of Gauss parallel to the substrate to increase the plasma density at a given pressure or to lower the operating pressure. In this article results from a two-dimensional hybrid-fluid computational investigation of MERIE reactors with plasmas sustained in argon are discussed for an industrially relevant geometry. The reduction in electron cross field mobility as the magnetic field increases produces a systematic decrease in the dc bias (becoming more positive). This decrease is accompanied by a decrease in the energy and increase in angular spread of the ion flux to the substrate. Similar trends are observed when decreasing pressure for a constant magnetic field. Although for constant power the magnitudes of ion fluxes to the substrate increase with moderate magnetic fields, the fluxes decreased at larger magnetic fields. These trends are due, in part, to a reduction in the contributions of more efficient multistep ionization

Use of magnesium as a test element for inductively coupled plasma atomic emission spectrometry diagnosis

International Nuclear Information System (INIS)

Mermet, J.M.

1991-01-01

To optimize atomization and ionization processes in an inductively coupled plasma used as a source in atomic emission spectrometry, the Mg II 280.270-nm/Mg I 285-213-nm line intensity ratio is used. A theoretic ratio is calculated assuming a local thermodynamic equilibrium.A review of previously published experimental values of the ratio is given as a function of the parameters influencing the energy transfer between the plasma and injected species. In particular, the effects of the power, the carrier gas flow-rate, the i.d. of the torch injector, the use of a sheathing gas and the presence of hydrogen are described. Values of the ratio close to the theoretical values are obtained with a high power (>1.4 kW), a lower carrier gas flow-rate ( -1 ) and a large i.d. of the injector (>2 mm). This optimization can also be applied to the minimization of interference effects due to the presence of sodium. (author). 64 refs.; 9 figs.; 1 tab

A method for studies on interactions between a gold-based drug and plasma proteins based on capillary electrophoresis with inductively coupled plasma mass spectrometry detection

DEFF Research Database (Denmark)

Nguyen, Tam T T N; Østergaard, Jesper; Gammelgaard, Bente

2015-01-01

An analytical method based on capillary electrophoresis (CE) and inductively coupled plasma mass spectrometry (ICP-MS) detection was developed for studies on the interaction of gold-containing drugs and plasma proteins using auranofin as example. A detection limit of 18 ng/mL of auranofin corresp...

Advanced oxide powders processing based on cascade plasma

International Nuclear Information System (INIS)

Solonenko, O P; Smirnov, A V

2014-01-01

Analysis of the potential advantages offered to thermal spraying and powder processing by the implementation of plasma torches with inter-electrode insert (IEI) or, in other words, cascade plasma torches (CPTs) is presented. The paper provides evidence that the modular designed single cathode CPT helps eliminate the following major disadvantages of conventional plasma torches: plasma parameters drifting, 1-5 kHz pulsing of plasma flow, as well as excessive erosion of electrodes. More stable plasma results in higher quality, homogeneity and reproducibility of plasma sprayed coatings and powders treated. In addition, CPT offers an extremely wide operating window, which allows better control of plasma parameters, particle dwell time and, consequently, particle temperature and velocity within a wide range by generating high enthalpy quasi-laminar plasmas, medium enthalpy transient plasmas, as well as relatively low enthalpy turbulent plasmas. Stable operation, flexibility with plasma gases as well as wide operating window of CPT should help significantly improve the existing plasma spraying processes and coatings, and also help develop new advanced technologies

Hydromechanical coupling in geologic processes

Science.gov (United States)

Neuzil, C.E.

2003-01-01

Earth's porous crust and the fluids within it are intimately linked through their mechanical effects on each other. This paper presents an overview of such "hydromechanical" coupling and examines current understanding of its role in geologic processes. An outline of the theory of hydromechanics and rheological models for geologic deformation is included to place various analytical approaches in proper context and to provide an introduction to this broad topic for nonspecialists. Effects of hydromechanical coupling are ubiquitous in geology, and can be local and short-lived or regional and very long-lived. Phenomena such as deposition and erosion, tectonism, seismicity, earth tides, and barometric loading produce strains that tend to alter fluid pressure. Resulting pressure perturbations can be dramatic, and many so-called "anomalous" pressures appear to have been created in this manner. The effects of fluid pressure on crustal mechanics are also profound. Geologic media deform and fail largely in response to effective stress, or total stress minus fluid pressure. As a result, fluid pressures control compaction, decompaction, and other types of deformation, as well as jointing, shear failure, and shear slippage, including events that generate earthquakes. By controlling deformation and failure, fluid pressures also regulate states of stress in the upper crust. Advances in the last 80 years, including theories of consolidation, transient groundwater flow, and poroelasticity, have been synthesized into a reasonably complete conceptual framework for understanding and describing hydromechanical coupling. Full coupling in two or three dimensions is described using force balance equations for deformation coupled with a mass conservation equation for fluid flow. Fully coupled analyses allow hypothesis testing and conceptual model development. However, rigorous application of full coupling is often difficult because (1) the rheological behavior of geologic media is complex

Viscosity calculated in simulations of strongly coupled dusty plasmas with gas friction

International Nuclear Information System (INIS)

Feng Yan; Goree, J.; Liu Bin

2011-01-01

A two-dimensional strongly coupled dusty plasma is modeled using Langevin and frictionless molecular dynamical simulations. The static viscosity η and the wave-number-dependent viscosity η(k) are calculated from the microscopic shear in the random motion of particles. A recently developed method of calculating the wave-number-dependent viscosity η(k) is validated by comparing the results of η(k) from the two simulations. It is also verified that the Green-Kubo relation can still yield an accurate measure of the static viscosity η in the presence of a modest level of friction as in dusty plasma experiments.

Characterization of a rotating nanoparticle cloud in an inductively coupled plasma

International Nuclear Information System (INIS)

Schulze, M; Keudell, A von; Awakowicz, P

2006-01-01

Carbon clusters with diameters in the range of 10 to 50 nm are produced by injecting pulses of acetylene into an inductively coupled plasma in argon and helium. The injection causes plasma instability, which becomes visible as an oscillation of the emission intensity. The frequency of this oscillation can be uniquely correlated to the particle diameter. Consequently, the measurement of the oscillation frequency represents a method to determine particle diameters in situ. The oscillation corresponds to the rotation of a localized plasmoid and a particle cloud around the symmetry axis of the reactor. It is assumed that this rotation is driven by the ion wind crossing the interface between the plasmoid and the particle cloud

Aerosol Vacuum-Assisted Plasma Ionization (Aero-VaPI) Coupled to Ion Mobility-Mass Spectrometry

Science.gov (United States)

Blair, Sandra L.; Ng, Nga L.; Zambrzycki, Stephen C.; Li, Anyin; Fernández, Facundo M.

2018-02-01

In this communication, we report on the real-time analysis of organic aerosol particles by Vacuum-assisted Plasma Ionization-Mass Spectrometry (Aero-VaPI-MS) using a home-built VaPI ion source coupled to a Synapt G2-S HDMS ion mobility-mass spectrometry (IM-MS) system. Standards of organic molecules of interest in prebiotic chemistry were used to generate aerosols. Monocaprin and decanoic acid aerosol particles were successfully detected in both the positive and negative ion modes, respectively. A complex aerosol mixture of different sizes of polymers of L-malic acid was also examined through ion mobility (IM) separations, resulting in the detection of polymers of up to eight monomeric units. This noncommercial plasma ion source is proposed as a low cost alternative to other plasma ionization platforms used for aerosol analysis, and a higher-performance alternative to more traditional aerosol mass spectrometers. VaPI provides robust online ionization of organics in aerosols without extensive ion activation, with the coupling to IM-MS providing higher peak capacity and excellent mass accuracy. [Figure not available: see fulltext.

The concept of coupling impedance in the self-consistent plasma wake field excitation

International Nuclear Information System (INIS)

Fedele, R.; Akhter, T.; De Nicola, S.; Migliorati, M.; Marocchino, A.; Massimo, F.; Palumbo, L.

2016-01-01

Within the framework of the Vlasov–Maxwell system of equations, we describe the self-consistent interaction of a relativistic charged-particle beam with the surroundings while propagating through a plasma-based acceleration device. This is done in terms of the concept of coupling (longitudinal) impedance in full analogy with the conventional accelerators. It is shown that also here the coupling impedance is a very useful tool for the Nyquist-type stability analysis. Examples of specific physical situations are finally illustrated.

Radicals and Non-Equilibrium Processes in Low-Temperature Plasmas

Science.gov (United States)

Petrović, Zoran; Mason, Nigel; Hamaguchi, Satoshi; Radmilović-Radjenović, Marija

2007-06-01

project the recent results onto the standard Townsend theory and phenomenology. New developments in plasma diagnostics are given by U Czarnetzki who studies application of the plasma series resonance effect in RF-discharges and by J Röpcke who describes the recent progress in understanding kinetics of molecular plasmas using laser absorption techniques. Theoretical description of the two frequency operation of capacitively coupled plasmas in CF4 mixtures is provided by Z Donko. Different plasma sources are well covered. First S Popović discusses microwave discharges in oxygen and the role of the oxygen metastable, K Becker analyzes UV production in dielectric barrier discharges while K Tachibana and O Sakai show results on generation and applications of atmospheric pressure glow discharges by integration of microplasmas Plasma surface interactions are addressed from the viewpoint of the surface processes (etching of organic dielectrics and Si in particular) by S Hamaguchi while the recent numerical techniques in predicting 3D etched profiles are presented by B Radjenović who discusses coupling of the profile charging and the level set calculations in 3D profile evolution simulations. A detailed study of SiO2 etching in two frequency plasma is provided by F Hamaoka, T Yagisawa and T Makabe. Plasmas may not only be used in their destructive (etching) mode, they may be used to build (deposit) new materials or structures. Thus plasma assisted growth of ultrathin oxides and nitrides on Si surfaces for CMOS applications is described in the paper by P Morgen and coworkers while E Neyts et al discuss reaction mechanisms and thin a-C:H film growth from low energy hydrocarbon radicals. Finally M Shiratani describes control of nano-strucutures produced by plasma CVD films and its application in development of novel photovoltaic devices. Although the major applications discussed in this Symposium were related to nano-electronics, much of the basic research was relevant for the

Plasma Immersion Ion Implantation in Radio Frequency Plasma

International Nuclear Information System (INIS)

Bora, B.; Bhuyan, H.; Wyndham, E.

2013-01-01

Plasma immersion ion implantation (PIII) has attracted wide interests since it emulates conventional ion-beam ion implantation (IBII) in niche applications. For instance, the technique has very high throughput, the implantation time is independent of the sample size, and samples with an irregular shape can be implanted without complex beam scanning or sample manipulation. For uniform ion implantation and deposition on to different substrates, like silicon, stainless steel etc., a capacitive coupled Radio frequency (RF), 13.6 MHz, plasma is used. During the PIII process, the physical parameters which are expected to play crucial rule in the deposition process like RF power, Negative pulse voltage and pulse duration, gas type and gas mixture, gas flow rates and the implantation dose are studied. The ion dose is calculated by dynamic sheath model and the plasma parameters are calculated from the V-I characteristic and power balance equation by homogeneous model of rf plasma discharge considering Ohmic as well as Stochastic heating. The correlations between the yield of the implantation process and the physical parameters as well as plasma parameters are discussed. (author)

PLASMA EMISSION BY NONLINEAR ELECTROMAGNETIC PROCESSES

Energy Technology Data Exchange (ETDEWEB)

Ziebell, L. F.; Petruzzellis, L. T.; Gaelzer, R. [Instituto de Física, UFRGS, Porto Alegre, RS (Brazil); Yoon, P. H. [Institute for Physical Science and Technology, University of Maryland, College Park (United States); Pavan, J., E-mail: luiz.ziebell@ufrgs.br, E-mail: laripetruzzellis@yahoo.com.br, E-mail: rudi.gaelzer@ufrgs.br, E-mail: yoonp@umd.edu, E-mail: joel.pavan@ufpel.edu.br [Instituto de Física e Matemática, UFPel, Pelotas, RS (Brazil)

2015-06-20

The plasma emission, or electromagnetic (EM) radiation at the plasma frequency and/or its harmonic(s), is generally accepted as the radiation mechanism responsible for solar type II and III radio bursts. Identification and characterization of these solar radio burst phenomena were done in the 1950s. Despite many decades of theoretical research since then, a rigorous demonstration of the plasma emission process based upon first principles was not available until recently, when, in a recent Letter, Ziebell et al. reported the first complete numerical solution of EM weak turbulence equations; thus, quantitatively analyzing the plasma emission process starting from the initial electron beam and the associated beam-plasma (or Langmuir wave) instability, as well as the subsequent nonlinear conversion of electrostatic Langmuir turbulence into EM radiation. In the present paper, the same problem is revisited in order to elucidate the detailed physical mechanisms that could not be reported in the brief Letter format. Findings from the present paper may be useful for interpreting observations and full-particle numerical simulations.

Influence of the low-frequency source parameters on the plasma characteristics in a dual frequency capacitively coupled plasma reactor: Two dimensional simulations

Institute of Scientific and Technical Information of China (English)

Xiang Xu; Hao Ge; Shuai Wang; Zhongling Dai; Younian Wang; Aimin Zhu

2009-01-01

A two-dimensional (2D) fluid model is presented to study the discharge of argon in a dual frequency capacitively coupled plasma (CCP) reactor. We are interested in the influence of low-frequency (LF) source parameters such as applied voltage amplitudes and low frequencies on the plasma characteristics. In this paper, the high frequency is set to 60 MHz with voltage 50 V. The simulations were carried out for low frequencies of 1, 2 and 6 MHz with LF voltage 100 V, and for LF voltages of 60, 90 and 120 V with low frequency 2 MHz. The results of 2D distributions of electric field and ion density, the ion flux impinging on the substrate and the ion energy on the powered electrode are shown. As the low frequency increases, two sources become from uncoupling to coupling, When two sources are uncoupling, the increase in LF has little impact on the plasma characteristics, but when two sources are coupling, the increase in LF decreases the uniformities of ion density and ion flux noticeably. It is also found that with the increase in LF voltage, the uniformities in the radial direction of ion density distribution and ion flux at the powered electrode decreases significantly, and the energy of ions bombarding on the powered electrode increases significantly.

Mass spectra and ionization temperatures in an argon-nitrogen inductively coupled plasma

International Nuclear Information System (INIS)

Houk, R.S.; Montaser, A.; Fassel, V.A.

1983-01-01

Positive ions were extracted from the axial channel of an inductively coupled plasma (ICP) in which the outer gas flow was Ar, N 2 , or a mixture of Ar and N 2 . Addition of N 2 to the outer gas decreases the electron number density (n/sub e/) in the axial channel. Ar +2 , O 2 + , and ArH + react with N-containing species in the plasma and/or during the ion extraction process. Ar + remains abundant even if there is no Ar in the outer gas, which indicates the probable occurrence of charge transfer reactions between N 2 + and Ar. The present work corroborates two general concepts upon which several theories of theorigin of suprathermal ionization in ICPs are based: (a) species are physically transported from the induction region to the axial channel; and (b) these species may react with a ionize neutral species in the axial channel. Ionization temperatures (T/sub ion/) measured from the ratio Cd + /I + were 5750 to 6700 K for a N 2 outer flow ICP a forward power of 1.2 kW. This T/sub ion/ range is significantly below that obtained for an Ar outer gas ICP under otherwise similar operating parameters

Experimental evaluation of analyte excitation mechanisms in the inductively coupled plasma

International Nuclear Information System (INIS)

Lehn, Scott A.; Hieftje, Gary M.

2003-01-01

The inductively coupled plasma (ICP) is a justifiably popular source for atomic emission spectrometry. However, despite its popularity, the ICP is still only partially understood. Even the mechanisms of analyte excitation remain unclear; some energy levels are quite clearly populated by charge transfer while others might be populated by electron-ion recombination, by electron impact, or by Penning processes. Distinguishing among these alternatives is possible by means of a steady-state kinetics approach that examines correlations between the emission of a selected atom, ion, or level and the local number densities of species assumed to produce the excitation. In an earlier investigation, strong correlations were found between either calcium atom or ion emission and selected combinations of calcium atom or ion number densities and electron number densities in the plasma. However, all radially resolved data employed in the earlier study were produced from Abel inversion and from measurements that were crude by today's standards. Now, by means of tomographic imaging, laser-saturated atomic fluorescence, and Thomson and Rayleigh scattering, it is possible to measure the required radially resolved data without Abel inversion and with far greater fidelity. The correlations previously studied for calcium have been investigated with these more reliable data. Ion-electron recombination, either radiative or with argon as a third body, was determined to be the most likely excitation mechanism for calcium atom, while electron impact appeared to be the most important process to produce excite-state calcium ions. These results were consistent with the previous study. However, the present study suggests that collisional deactivation, rather than radiative decay, is the most likely mode of returning both calcium atoms and ions to the ground state

Some Temperature Effects on AISI-304 Nitriding in an Inductively Coupled RF Plasma

International Nuclear Information System (INIS)

Valencia-Alvarado, R.; Barocio, S. R.; Mercado-Cabrera, A.; Pena-Eguiluz, R.; Munoz-Castro, A. E.; Piedad-Beneitez, A. de la; Rosa-Vazquez, J. de la; Lopez-Callejas, R.; Godoy-Cabrera, O. G.

2006-01-01

Some recent results obtained from nitriding AISI 304 stainless steel samples, 1.2 cm in diameter and 0.5 cm thick are reported here in the case of an 85% hydrogen and 15% nitrogen mixture work gas. The process was carried out from 300 to 400 W for (13.56 MHz) inductively coupled plasma within a 60 cm long pyrex glass tube 3.5 cm in diameter where the samples were biased up to -300 V with respect to earth. The resulting hardness appears to be a function of the substrate temperature which varied from 200 deg. C at a 0 V bias to 550 deg. C at -300 V. The plasma density at 400 W reached 3x1010 cm-3 with a 4 eV electron temperature. Prior to nitriding, all the samples were polished with 0.05 μm diamond paste, leading to a 30 nm average roughness (Ra). After nitriding at -300 V, the Ra rose until ∼400 nm while hardness values of 1500 HV under 300 g loads were measured. X ray diffraction indicates that the extended phase amplitude (γN), Fe and Cr nitride depends on the substrate temperature

Determination of platinum in human subcellular microsamples by inductively coupled plasma mass spectrometry

DEFF Research Database (Denmark)

Björn, Erik; Nygren, Yvonne; Nguyen, Tam T. T. N.

2007-01-01

A fast and robust method for the determination of platinum in human subcellular microsamples by inductively coupled plasma mass spectrometry was developed, characterized, and validated. Samples of isolated DNA and exosome fractions from human ovarian (2008) and melanoma (T289) cancer cell lines w...

Trace metal analysis of road dust by inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Powell, M.J.; Liu, L.; Gnanalingham, N.; Peters, L.

2000-01-01

Dust from roads in an air impingement zone close to anthropogenic sources of air pollutants can be a concern for people living in the immediate vicinity. The Ministry of the Environment (MOE) has conducted a case study to monitor the concentration of uranium, strontium, thorium and arsenic in road dust from one such area. A method for the analysis of road dust by inductively coupled plasma mass spectrometry (ICP-MS) has been developed with detection limits in the ng/1 range. A digestion technique has been developed by conducting experiments using single and combinations of acids in open-vessel wet digestions. Accuracy has been determined by the use of matrix representative certified reference materials (CRMs). Digestion precision was determined by elemental concentration measurements of the most representative CRM through replicates. Spike recovery data were from 95% to 110% for all elements, and inter-method comparison studies between hydride generation atomic absorption spectrometry (AAS) inductively coupled plasma atomic emission spectrometry (ICP-AES) and ICP-MS for arsenic and strontium show good agreement. (author)

Standard test method for determining elements in waste streams by inductively coupled plasma-atomic emission spectroscopy

International Nuclear Information System (INIS)

Anon.

1989-01-01

This test method covers the determination of trace, minor, and major elements in waste streams by inductively coupled plasma-atomic emission spectroscopy (ICP-AES) following an acid digestion of the specimen. Waste streams from manufacturing processes of nuclear and nonnuclear materials can be analyzed. This test method is applicable to the determination of total metals. Results from this test method can be used to characterize waste received by treatment facilities and to formulate appropriate treatment recipes. The results are also usable to process control within waste treatment facilities. This test method is applicable only to waste streams that contain radioactivity levels which do not require special personnel or environmental protection. A list of the elements determined in waste streams and the corresponding lower reporting limit is included

Modeling the astrophysical dynamical process with laser-plasmas

International Nuclear Information System (INIS)

Xia Jiangfan; Zhang Jun; Zhang Jie

2001-01-01

The use of the state-of-the-art laser facility makes it possible to create conditions of the same or similar to those in the astrophysical processes. The introduction of the astrophysics-relevant ideas in laser-plasma experiments is propitious to the understanding of the astrophysical phenomena. However, the great difference between the laser-produced plasmas and the astrophysical processes makes it awkward to model the latter by laser-plasma experiments. The author addresses the physical backgrounds for modeling the astrophysical plasmas by laser plasmas, connecting these two kinds of plasmas by scaling laws. Thus, allowing the creation of experimental test beds where observations and models can be quantitatively compared with laser-plasma data. Special attentions are paid on the possibilities of using home-made laser facilities to model astrophysical phenomena

Initial design for an experimental investigation of strongly coupled plasma behavior in the Atlas facility

Energy Technology Data Exchange (ETDEWEB)

Munson, C.P.; Benage, J.F. Jr.; Taylor, A.J.; Trainor, R.J. Jr.; Wood, B.P.; Wysocki, F.J.

1999-07-01

Atlas is a high current ({approximately} 30 MA peak, with a current risetime {approximately} 4.5 {micro}sec), high energy (E{sub stored} = 24 MJ, E{sub load} = 3--6 MJ), pulsed power facility which is being constructed at Los Alamos National Laboratory with a scheduled completion date in the year 2000. When operational, this facility will provide a platform for experiments in high pressure shocks (> 20 Mbar), adiabatic compression ({rho}/{rho}{sub 0} > 5, P > 10 Mbar), high magnetic fields ({approximately} 2,000 T), high strain and strain rates ({var_epsilon} > 200%, d{var_epsilon}/dt {approximately} 10{sup 4} to 10{sup 6} s{sup {minus}1}), hydrodynamic instabilities of materials in turbulent regimes, magnetized target fusion, equation of state, and strongly coupled plasmas. For the strongly coupled plasma experiments, an auxiliary capacitor bank will be used to generate a moderate density (< 0.1 solid), relatively cold ({approximately} 1 eV) plasma by ohmic heating of a conducting material of interest such as titanium. This stargate plasma will be compressed against a central column containing diagnostic instrumentation by a cylindrical conducting liner that is driven radially inward by current from the main Atlas capacitor bank. The plasma is predicted to reach densities of {approximately} 1.1 times solid, achieve ion and electron temperatures of {approximately} 10 eV, and pressures of {approximately} 4--5 Mbar. This is a density/temperature regime which is expected to experience strong coupling, but only partial degeneracy. X-ray radiography is planned for measurements of the material density at discrete times during the experiments; diamond Raman measurements are anticipated for determination of the pressure. In addition, a neutron resonance spectroscopic technique is being evaluated for possible determination of the temperature (through low percentage doping of the titanium with a suitable resonant material). Initial target plasma formation experiments are

Initial design for an experimental investigation of strongly coupled plasma behavior in the Atlas facility

International Nuclear Information System (INIS)

Munson, C.P.; Benage, J.F. Jr.; Taylor, A.J.; Trainor, R.J. Jr.; Wood, B.P.; Wysocki, F.J.

1999-01-01

Atlas is a high current (approximately 30 MA peak, with a current risetime approximately 4.5 microsec), high energy (E stored = 24 MJ, E load = 3--6 MJ), pulsed power facility which is being constructed at Los Alamos National Laboratory with a scheduled completion date in the year 2000. When operational, this facility will provide a platform for experiments in high pressure shocks (> 20 Mbar), adiabatic compression (ρ/ρ 0 > 5, P > 10 Mbar), high magnetic fields (approximately 2,000 T), high strain and strain rates (var e psilon > 200%, dvar e psilon/dt approximately 10 4 to 10 6 s -1 ), hydrodynamic instabilities of materials in turbulent regimes, magnetized target fusion, equation of state, and strongly coupled plasmas. For the strongly coupled plasma experiments, an auxiliary capacitor bank will be used to generate a moderate density (< 0.1 solid), relatively cold (approximately 1 eV) plasma by ohmic heating of a conducting material of interest such as titanium. This stargate plasma will be compressed against a central column containing diagnostic instrumentation by a cylindrical conducting liner that is driven radially inward by current from the main Atlas capacitor bank. The plasma is predicted to reach densities of approximately 1.1 times solid, achieve ion and electron temperatures of approximately 10 eV, and pressures of approximately 4--5 Mbar. This is a density/temperature regime which is expected to experience strong coupling, but only partial degeneracy. X-ray radiography is planned for measurements of the material density at discrete times during the experiments; diamond Raman measurements are anticipated for determination of the pressure. In addition, a neutron resonance spectroscopic technique is being evaluated for possible determination of the temperature (through low percentage doping of the titanium with a suitable resonant material). Initial target plasma formation experiments are being planned on an existing pulsed power facility at LANL and

Multiplex bio-assay with inductively coupled plasma mass spectrometry: Towards a massively multivariate single-cell technology

International Nuclear Information System (INIS)

Tanner, Scott D.; Ornatsky, Olga; Bandura, Dmitry R.; Baranov, Vladimir I.

2007-01-01

Recent progress in the development of massively multiplexed bioanalytical assays using element tags with inductively coupled plasma mass spectrometry detection is reviewed. Feasibility results using commercially available secondary immunolabeling reagents for leukemic cell lines are presented. Multiplex analysis of higher order is shown with first generation tag reagents based on functionalized carriers that bind lanthanide ions. DNA quantification using metallointercalation allows for cell enumeration or mitotic state differentiation. In situ hybridization permits the determination of cellular RNA. The results provide a feasibility basis for the development of a multivariate assay tool for individual cell analysis based on inductively coupled plasma mass spectrometry in a cytometer configuration

Multiplex bio-assay with inductively coupled plasma mass spectrometry: Towards a massively multivariate single-cell technology

Energy Technology Data Exchange (ETDEWEB)

Tanner, Scott D. [Institute of Biomaterials and Biomedical Engineering, University of Toronto, Room 407, 164 College Street, Toronto, Ontario, M5S 3G9 (Canada)], E-mail: sd.tanner@utoronto.ca; Ornatsky, Olga; Bandura, Dmitry R.; Baranov, Vladimir I. [Institute of Biomaterials and Biomedical Engineering, University of Toronto, Room 407, 164 College Street, Toronto, Ontario, M5S 3G9 (Canada)

2007-03-15

Recent progress in the development of massively multiplexed bioanalytical assays using element tags with inductively coupled plasma mass spectrometry detection is reviewed. Feasibility results using commercially available secondary immunolabeling reagents for leukemic cell lines are presented. Multiplex analysis of higher order is shown with first generation tag reagents based on functionalized carriers that bind lanthanide ions. DNA quantification using metallointercalation allows for cell enumeration or mitotic state differentiation. In situ hybridization permits the determination of cellular RNA. The results provide a feasibility basis for the development of a multivariate assay tool for individual cell analysis based on inductively coupled plasma mass spectrometry in a cytometer configuration.

Experimental observation of strong coupling effects on the dispersion of dust acoustic waves in a plasma

Energy Technology Data Exchange (ETDEWEB)

Bandyopadhyay, P. [Institute for Plasma Research, Bhat, Gandhinagar 382428 (India)], E-mail: pintu@ipr.res.in; Prasad, G.; Sen, A.; Kaw, P.K. [Institute for Plasma Research, Bhat, Gandhinagar 382428 (India)

2007-09-03

The dispersion properties of low frequency dust acoustic waves in the strong coupling regime are investigated experimentally in an argon plasma embedded with a mixture of kaolin and MnO{sub 2} dust particles. The neutral pressure is varied over a wide range to change the collisional properties of the dusty plasma. In the low collisional regime the turnover of the dispersion curve at higher wave numbers and the resultant region of {partial_derivative}{omega}/{partial_derivative}k<0 are identified as signatures of dust-dust correlations. In the high collisional regime dust neutral collisions produce a similar effect and prevent an unambiguous identification of strong coupling effects.

Experimental observation of strong coupling effects on the dispersion of dust acoustic waves in a plasma

International Nuclear Information System (INIS)

Bandyopadhyay, P.; Prasad, G.; Sen, A.; Kaw, P.K.

2007-01-01

The dispersion properties of low frequency dust acoustic waves in the strong coupling regime are investigated experimentally in an argon plasma embedded with a mixture of kaolin and MnO 2 dust particles. The neutral pressure is varied over a wide range to change the collisional properties of the dusty plasma. In the low collisional regime the turnover of the dispersion curve at higher wave numbers and the resultant region of ∂ω/∂k<0 are identified as signatures of dust-dust correlations. In the high collisional regime dust neutral collisions produce a similar effect and prevent an unambiguous identification of strong coupling effects

Experimental observation of strong coupling effects on the dispersion of dust acoustic waves in a plasma

Science.gov (United States)

Bandyopadhyay, P.; Prasad, G.; Sen, A.; Kaw, P. K.

2007-09-01

The dispersion properties of low frequency dust acoustic waves in the strong coupling regime are investigated experimentally in an argon plasma embedded with a mixture of kaolin and MnO2 dust particles. The neutral pressure is varied over a wide range to change the collisional properties of the dusty plasma. In the low collisional regime the turnover of the dispersion curve at higher wave numbers and the resultant region of ∂ω/∂k<0 are identified as signatures of dust dust correlations. In the high collisional regime dust neutral collisions produce a similar effect and prevent an unambiguous identification of strong coupling effects.

Modeling of low pressure plasma sources for microelectronics fabrication

International Nuclear Information System (INIS)

Agarwal, Ankur; Bera, Kallol; Kenney, Jason; Rauf, Shahid; Likhanskii, Alexandre

2017-01-01

Chemically reactive plasmas operating in the 1 mTorr–10 Torr pressure range are widely used for thin film processing in the semiconductor industry. Plasma modeling has come to play an important role in the design of these plasma processing systems. A number of 3-dimensional (3D) fluid and hybrid plasma modeling examples are used to illustrate the role of computational investigations in design of plasma processing hardware for applications such as ion implantation, deposition, and etching. A model for a rectangular inductively coupled plasma (ICP) source is described, which is employed as an ion source for ion implantation. It is shown that gas pressure strongly influences ion flux uniformity, which is determined by the balance between the location of plasma production and diffusion. The effect of chamber dimensions on plasma uniformity in a rectangular capacitively coupled plasma (CCP) is examined using an electromagnetic plasma model. Due to high pressure and small gap in this system, plasma uniformity is found to be primarily determined by the electric field profile in the sheath/pre-sheath region. A 3D model is utilized to investigate the confinement properties of a mesh in a cylindrical CCP. Results highlight the role of hole topology and size on the formation of localized hot-spots. A 3D electromagnetic plasma model for a cylindrical ICP is used to study inductive versus capacitive power coupling and how placement of ground return wires influences it. Finally, a 3D hybrid plasma model for an electron beam generated magnetized plasma is used to understand the role of reactor geometry on plasma uniformity in the presence of E  ×  B drift. (paper)

Modeling of low pressure plasma sources for microelectronics fabrication

Science.gov (United States)

Agarwal, Ankur; Bera, Kallol; Kenney, Jason; Likhanskii, Alexandre; Rauf, Shahid

2017-10-01

Chemically reactive plasmas operating in the 1 mTorr-10 Torr pressure range are widely used for thin film processing in the semiconductor industry. Plasma modeling has come to play an important role in the design of these plasma processing systems. A number of 3-dimensional (3D) fluid and hybrid plasma modeling examples are used to illustrate the role of computational investigations in design of plasma processing hardware for applications such as ion implantation, deposition, and etching. A model for a rectangular inductively coupled plasma (ICP) source is described, which is employed as an ion source for ion implantation. It is shown that gas pressure strongly influences ion flux uniformity, which is determined by the balance between the location of plasma production and diffusion. The effect of chamber dimensions on plasma uniformity in a rectangular capacitively coupled plasma (CCP) is examined using an electromagnetic plasma model. Due to high pressure and small gap in this system, plasma uniformity is found to be primarily determined by the electric field profile in the sheath/pre-sheath region. A 3D model is utilized to investigate the confinement properties of a mesh in a cylindrical CCP. Results highlight the role of hole topology and size on the formation of localized hot-spots. A 3D electromagnetic plasma model for a cylindrical ICP is used to study inductive versus capacitive power coupling and how placement of ground return wires influences it. Finally, a 3D hybrid plasma model for an electron beam generated magnetized plasma is used to understand the role of reactor geometry on plasma uniformity in the presence of E  ×  B drift.

Laser and Plasma Parameters for Laser Pulse Amplification by Stimulated Brillouin Backscattering in the Strong Coupling Regime

Science.gov (United States)

Gangolf, Thomas; Blecher, Marius; Bolanos, Simon; Lancia, Livia; Marques, Jean-Raphael; Cerchez, Mirela; Prasad, Rajendra; Aurand, Bastian; Loiseau, Pascal; Fuchs, Julien; Willi, Oswald

2017-10-01

In the ongoing quest for novel techniques to obtain ever higher laser powers, plasma amplification has drawn much attention, benefiting from the fact that a plasma can sustain much higher energy densities than a solid state amplifier. As a plasma process, Stimulated Brillouin Backscattering in the strong coupling regime (sc-SBS) can be used to transfer energy from one laser pulse (pump) to another (seed), by a nonlinear ion oscillation forced by the pump laser. Here, we report on experimental results on amplification by sc-SBS using the ARCTURUS Ti:Sapphire multi-beam laser system at the University of Duesseldorf, Germany. Counter-propagating in a supersonic Hydrogen gas jet target, an ultrashort seed pulse with a pulse duration between 30 and 160 fs and an energy between 1 and 12 mJ was amplified by a high-energy pump pulse (1.7 ps, 700 mJ). For some of the measurements, the gas was pre-ionized with a separate laser pulse (780 fs, 460 mJ). Preliminary analysis shows that the amplification was larger for the longer seed pulses, consistent with theoretical predictions.

Comparison of inductively coupled plasma mass spectrometry with inductively coupled plasma atomic emission spectrometry and instrumental neutron activation analysis for the determination of rare earth elements in Greek bauxites

International Nuclear Information System (INIS)

Ochsenkuehn-Petropoulou, Maria; Luck, Joachim

1991-01-01

Fore the determination of rare earth elements (REE) in bauxitic materials the techniques of inductively coupled plasma mass spectrometry (ICP-MS), inductively coupled plasma atomic emission spectrometry (ICP-AES) and instrumental neutron activation analysis (INAA) were compared. In the NIST (National Institute of Standards and Technology) bauxites SRM 697 Dominican, and SRM 69 b Arkansas, the concentration of some REEs were determined. With the reference bauxite BX-N of the ARNT (Association Nationale de la Recherche Technique) the precision and accuracy of ICP-AES for the determination of REEs in bauxites was tested. Furthermore, Greek bauxites of the Parnassos-Giona area were investigated. In a comparison of the three methods it was possible to calculate from the data series the precision of each method, which showed that the tendency found in the deviations for the different REEs is in accordance with published values. Also the limits of detection for REEs in bauxites were calculated and found to be in the same range as those in the literature. (author)

Hydrogen production using plasma processing

International Nuclear Information System (INIS)

Wagner, D.; Whidden, T.K.

2006-01-01

Plasma processing is a promising method of extracting hydrogen from natural gas while avoiding the greenhouse gas (GHG) production typical of other methods such as steam methane reforming. This presentation describes a plasma discharge process based that, in a single reactor pass, can yield hydrogen concentrations of up to 50 % by volume in the product gas mixture. The process is free of GHG's, does not require catalysts and is easily scalable. Chemical and morphological analyses of the gaseous and solid products of the process by gas-chromatography/mass-spectrometry, microscopic Raman analyses and electron microscopy respectively are reviewed. The direct production of hydrogen-enriched natural gas (HENG) as a fuel for low pollution internal combustion engines and its purification to high-purity hydrogen (99.99%) from the product gas by pressure swing adsorption (PSA) purifier beds are reviewed. The presentation reviews potential commercial applications for the technology

Polymerization by plasma of trichloroethylene by means of resistive and inductive coupling

International Nuclear Information System (INIS)

Vasquez, M.; Cruz, G.; Olayo, M.G.; Timoshina, T.; Morales, J.; Olayo, R.

2004-01-01

It was carried out the polymerization for plasma of the trichloroethylene by means of two types of coupling, resistive and inductive with the objective of studying the structure, morphology and the electric properties of the polymers obtained under these conditions. The structure and morphology of the polymers were studied by means of EDS and FT-IR spectroscopies. (Author)

High-rate reduction of copper oxide using atmospheric-pressure inductively coupled plasma microjets

International Nuclear Information System (INIS)

Tajima, Satomi; Tsuchiya, Shouichi; Matsumori, Masashi; Nakatsuka, Shigeki; Ichiki, Takanori

2011-01-01

Reduction of copper oxide was performed using an atmospheric-pressure inductively coupled plasma (AP-ICP) microjet while varying the input power P between 15 and 50 W. Cuprous oxide (Cu 2 O) and cupric oxide (CuO) were formed on the sputtered Cu surface by thermal annealing. Dynamic behavior of the microplasma jet, optical emission from H atoms, the substrate temperature, chemical bonding states of the treated surface, and the thickness of the reduced Cu layer were measured to study the fundamental reduction process. Surface composition and the thickness of the reduced Cu layer changed significantly with P. Rapid reduction of CuO and Cu 2 O was achieved at a rate of 493 nm/min at P = 50 W since high-density H atoms were produced by the AP-ICP microjet.

High-rate reduction of copper oxide using atmospheric-pressure inductively coupled plasma microjets

Energy Technology Data Exchange (ETDEWEB)

Tajima, Satomi; Tsuchiya, Shouichi [Department of Bioengineering, Graduate School of Engineering, University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, 113-8656 (Japan); Matsumori, Masashi; Nakatsuka, Shigeki [Panasonic Factory Solutions Co., Ltd., 2-7 Matsuba-cho, Kadoma-city, Osaka, 571-8502 (Japan); Ichiki, Takanori, E-mail: ichiki@sogo.t.u-tokyo.ac.jp [Department of Bioengineering, Graduate School of Engineering, University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, 113-8656 (Japan); Institute of Engineering Innovation, Graduate School of Engineering, University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo, 113-8656 (Japan)

2011-08-01

Reduction of copper oxide was performed using an atmospheric-pressure inductively coupled plasma (AP-ICP) microjet while varying the input power P between 15 and 50 W. Cuprous oxide (Cu{sub 2}O) and cupric oxide (CuO) were formed on the sputtered Cu surface by thermal annealing. Dynamic behavior of the microplasma jet, optical emission from H atoms, the substrate temperature, chemical bonding states of the treated surface, and the thickness of the reduced Cu layer were measured to study the fundamental reduction process. Surface composition and the thickness of the reduced Cu layer changed significantly with P. Rapid reduction of CuO and Cu{sub 2}O was achieved at a rate of 493 nm/min at P = 50 W since high-density H atoms were produced by the AP-ICP microjet.

Hydrogen atom kinetics in capacitively coupled plasmas

Science.gov (United States)

Nunomura, Shota; Katayama, Hirotaka; Yoshida, Isao

2017-05-01

Hydrogen (H) atom kinetics has been investigated in capacitively coupled very high frequency (VHF) discharges at powers of 16-780 mW cm-2 and H2 gas pressures of 0.1-2 Torr. The H atom density has been measured using vacuum ultra violet absorption spectroscopy (VUVAS) with a micro-discharge hollow cathode lamp as a VUV light source. The measurements have been performed in two different electrode configurations of discharges: conventional parallel-plate diode and triode with an intermediate mesh electrode. We find that in the triode configuration, the H atom density is strongly reduced across the mesh electrode. The H atom density varies from ˜1012 cm-3 to ˜1010 cm-3 by crossing the mesh with 0.2 mm in thickness and 36% in aperture ratio. The fluid model simulations for VHF discharge plasmas have been performed to study the H atom generation, diffusion and recombination kinetics. The simulations suggest that H atoms are generated in the bulk plasma, by the electron impact dissociation (e + H2 \\to e + 2H) and the ion-molecule reaction (H2 + + H2 \\to {{{H}}}3+ + H). The diffusion of H atoms is strongly limited by a mesh electrode, and thus the mesh geometry influences the spatial distribution of the H atoms. The loss of H atoms is dominated by the surface recombination.

Plasma spraying process of disperse carbides for spraying and facing

International Nuclear Information System (INIS)

Blinkov, I.V.; Vishnevetskaya, I.A.; Kostyukovich, T.G.; Ostapovich, A.O.

1989-01-01

A possibility to metallize carbides in plasma of impulsing capacitor discharge is considered. Powders granulation occurs during plasma spraying process, ceramic core being completely capped. X-ray phase and chemical analyses of coatings did not show considerable changes of carbon content in carbides before and after plasma processing. This distinguishes the process of carbides metallization in impulsing plasma from the similar processing in arc and high-frequency plasma generator. Use of powder composites produced in the impulsing capacitor discharge, for plasma spraying and laser facing permits 2-3 times increasing wear resistance of the surface layer as against the coatings produced from mechanical powders mixtures

Microwave Plasma Sources for Gas Processing

International Nuclear Information System (INIS)

Mizeraczyk, J.; Jasinski, M.; Dors, M.; Zakrzewski, Z.

2008-01-01

In this paper atmospheric pressure microwave discharge methods and devices used for producing the non-thermal plasmas for processing of gases are presented. The main part of the paper concerns the microwave plasma sources (MPSs) for environmental protection applications. A few types of the MPSs, i.e. waveguide-based surface wave sustained MPS, coaxial-line-based and waveguide-based nozzle-type MPSs, waveguide-based nozzleless cylinder-type MPS and MPS for microdischarges are presented. Also, results of the laboratory experiments on the plasma processing of several highly-concentrated (up to several tens percent) volatile organic compounds (VOCs), including Freon-type refrigerants, in the moderate (200-400 W) waveguide-based nozzle-type MPS (2.45 GHz) are presented. The results showed that the microwave discharge plasma fully decomposed the VOCs at relatively low energy cost. The energy efficiency of VOCs decomposition reached 1000 g/kWh. This suggests that the microwave discharge plasma can be a useful tool for environmental protection applications. In this paper also results of the use of the waveguide-based nozzleless cylinder-type MPS to methane reforming into hydrogen are presented

Plasma Discharge Process in a Pulsed Diaphragm Discharge System

Science.gov (United States)

Duan, Jianjin; Hu, Jue; Zhang, Chao; Wen, Yuanbin; Meng, Yuedong; Zhang, Chengxu

2014-12-01

As one of the most important steps in wastewater treatment, limited study on plasma discharge process is a key challenge in the development of plasma applications. In this study, we focus on the plasma discharge process of a pulsed diaphragm discharge system. According to the analysis, the pulsed diaphragm discharge proceeds in seven stages: (1) Joule heating and heat exchange stage; (2) nucleated site formation; (3) plasma generation (initiation of the breakdown stage); (4) avalanche growth and plasma expansion; (5) plasma contraction; (6) termination of the plasma discharge; and (7) heat exchange stage. From this analysis, a critical voltage criterion for breakdown is obtained. We anticipate this finding will provide guidance for a better application of plasma discharges, especially diaphragm plasma discharges.

Coupled plasma-neutral transport model for the scrape-off region

International Nuclear Information System (INIS)

Galambos, J.D.; Peng, Y.K.M.; Heifetz, D.

1985-03-01

Analysis of the scrape-off region requires treatment of the plasma transport along and across the field lines and inclusion of the neutral transport effects. A method for modeling the scrape-off region that is presented here uses separate models for each of these aspects that are coupled together through an iteration procedure that requires only minimal numerical effort. The method is applied here to estimate the neutral pumping rates in the pump-limiter and divertor options for a proposed deuterium-tritium (D-T) ignition experiment. High neutral recycling in the vicinity of the neutralizer plate dramatically affects pumping rates for both the pump-limiter and divertor. In both cases, the plasma flow into the channel surrounding the neutralizer plate is greatly reduced by the neutral recycling. The fraction of this flow that is pumped can be large (> 50%), but in general it is dependent on the particular geometry and plasma conditions. It is estimated that pumping speeds approximately greater than 10 5 L/s are adequate for the exhaust requirements in the pump-limiter and the divertor cases. Also, high neutral recycling on the front surface of the limiter tends to increase the neutral pumping rate

Etching of Niobium in an Argon-Chlorine Capacitively Coupled Plasma

Science.gov (United States)

Radovanov, Svetlana; Samolov, Ana; Upadhyay, Janardan; Peshl, Jeremy; Popovic, Svetozar; Vuskovic, Leposava; Applied Materials, Varian Semiconductor Team; Old Dominion University Team

2016-09-01

Ion assisted etching of the inner surfaces of Nb superconducting radio frequency (SRF) cavities requires control of incident ion energies and fluxes to achieve the desired etch rate and smooth surfaces. In this paper, we combine numerical simulation and experiment to investigate Ar /Cl2 capacitively coupled plasma (CCP) in cylindrical reactor geometry. Plasma simulations were done in the CRTRS 2D/3D code that self-consistently solves for CCP power deposition and electrostatic potential. The experimental results are used in combination with simulation predictions to understand the dependence of plasma parameters on the operating conditions. Using the model we were able to determine the ion current and flux at the Nb substrate. Our simulations indicate the relative importance of the current voltage phase shift and displacement current at different pressures and powers. For simulation and the experiment we have used a test structure with a pillbox cavity filled with niobium ring-type samples. The etch rate of these samples was measured. The probe measurements were combined with optical emission spectroscopy in pure Ar for validation of the model. The authors acknowledge Dr Shahid Rauf for developing the CRTRS code. Support DE-SC0014397.

Surface properties of indium tin oxide treated by Cl{sub 2} inductively coupled plasma

Energy Technology Data Exchange (ETDEWEB)

He, Kongduo; Yang, Xilu; Yan, Hang; Gong, Junyi; Zhong, Shaofeng [Department of Light Sources and Illuminating Engineering, Fudan University, Shanghai 200433 (China); Ou, Qiongrong, E-mail: qrou@fudan.edu.cn [Department of Light Sources and Illuminating Engineering, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Shanghai 200433 (China); Liang, Rongqing [Department of Light Sources and Illuminating Engineering, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Shanghai 200433 (China)

2014-10-15

Graphical abstract: - Highlights: • The work function of chlorinated ITO increases initially by up to 1 eV. • The chlorinated ITO keeps an increment of work function of 0.3 eV after 100 days. • The WF decrease curves can be fitted with double exponential functions. • The desorption of unstable Cl in the surface leads to the rapid decrease of WF. • The core levels of In 3d5 and Sn 3d5 and O 1s shift toward higher binding energies. - Abstract: The effects of Cl{sub 2} inductively coupled plasma (ICP) treatment on the time dependence of work function (WF) and surface properties of indium tin oxide (ITO) were investigated. Kelvin probe (KP) measurements show that the WF after Cl{sub 2} ICP treatment is close to 5.9 eV. The WF decrease curve of Cl{sub 2} plasma treated ITO is fitted with double exponential functions with an adjusted R-square of 0.99. The mechanism under the decrease process is discussed by X-ray photoelectron spectroscopy (XPS). The ITO WF decrease after Cl{sub 2} ICP treatment performs much better than that after O{sub 2} ICP treatment and the chlorinated ITO keeps a WF increment of 0.3 eV compared with that without plasma treatment after 100 days. Other properties of chlorinated ITO surface such as morphology and transmittance change slightly. The results are significant for the understanding of degradation of Cl{sub 2} plasma treated ITO and the fabrication of organic semiconductor devices.

Automatic system for processing the plasma radiation spectra

International Nuclear Information System (INIS)

Isakaev, Eh.Kh.; Markin, A.V.; Khajmin, V.A.; Chinnov, V.F.

2001-01-01

One is tackling a problem to ensure computer for processing of experimental data when studying plasma obtained due to the present day systems to acquire information. One elaborated rather simple and reliable programs for processing. The system is used in case of plasma quantitative spectroscopy representing the classical and most widely used method to analyze the parameters and the properties of low-temperature and high-temperature plasma [ru

Fast quantification of endogenous carbohydrates in plasma using hydrophilic interaction liquid chromatography coupled with tandem mass spectrometry.

Science.gov (United States)

Zhu, Bangjie; Liu, Feng; Li, Xituo; Wang, Yan; Gu, Xue; Dai, Jieyu; Wang, Guiming; Cheng, Yu; Yan, Chao

2015-01-01

Endogenous carbohydrates in biosamples are frequently highlighted as the most differential metabolites in many metabolomics studies. A simple, fast, simultaneous quantitative method for 16 endogenous carbohydrates in plasma has been developed using hydrophilic interaction liquid chromatography coupled with tandem mass spectrometry. In order to quantify 16 endogenous carbohydrates in plasma, various conditions, including columns, chromatographic conditions, mass spectrometry conditions, and plasma preparation methods, were investigated. Different conditions in this quantified analysis were performed and optimized. The reproducibility, precision, recovery, matrix effect, and stability of the method were verified. The results indicated that a methanol/acetonitrile (50:50, v/v) mixture could effectively and reproducibly precipitate rat plasma proteins. Cold organic solvents coupled with vortex for 1 min and incubated at -20°C for 20 min were the most optimal conditions for protein precipitation and extraction. The results, according to the linearity, recovery, precision, matrix effect, and stability, showed that the method was satisfactory in the quantification of endogenous carbohydrates in rat plasma. The quantified analysis of endogenous carbohydrates in rat plasma performed excellently in terms of sensitivity, high throughput, and simple sample preparation, which met the requirement of quantification in specific expanded metabolomic studies after the global metabolic profiling research. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

In situ calibration of inductively coupled plasma-atomic emission and mass spectroscopy

Science.gov (United States)

Braymen, Steven D.

1996-06-11

A method and apparatus for in situ addition calibration of an inductively coupled plasma atomic emission spectrometer or mass spectrometer using a precision gas metering valve to introduce a volatile calibration gas of an element of interest directly into an aerosol particle stream. The present situ calibration technique is suitable for various remote, on-site sampling systems such as laser ablation or nebulization.

Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles

Science.gov (United States)

Tawidian, H.; Mikikian, M.; Couëdel, L.; Lecas, T.

2011-11-01

Small plasma spheroids are evidenced and analyzed in front of the electrodes of a capacitively-coupled radio-frequency discharge in which dust particles are growing. These regions are characterized by a spherical shape, a slightly enhanced luminosity and are related to instabilities induced by the presence of dust particles. Several types of behaviors are identified and particularly their chaotic appearance or disappearance and their rotational motion along the electrode periphery. Correlations with the unstable behavior of the global plasma glow are performed. These analyses are obtained thanks to high-speed imaging which is the only diagnostics able to evidence these plasma spheroids.

The Use of Plasma Technique in Nitridation Process of Metal Alloy DIN 42CrMo4

International Nuclear Information System (INIS)

Purwanto; Malau, Viktor; Tjipto Sujitno

2003-01-01

Nitridation process with plasma technique is one of technique for surface treatment of a material. Research on plasma technique for nitridation process has been carried out to find out the nitridation effect on properties of metal alloy DIN 42CrM04. Nitridation process with plasma technique was conducted in a vacuum tube under following conditions 0.36 torr of pressure, 300 o C of temperature and nitridation times 1, 2, and 3 hours. Nitridation process was followed by hardness test measurement using High Quality Micro Hardness Tester machine, serial number MM-0054, as well as microstructure test using Scanning Electron Microscope (SEM) coupled with Energy Dispersive Spectroscopy (EDS) EDAX-DX4. The results showed that surface hardness increased after nitridation process. For nitridation processes for 1, 2, and 3 hours, the hardness increased from 291 kg/mm 2 to 303 kg/mm 2 , 324 kg/mm 2 and 403 kg/mm 2 , respectively. The results from micro structure observation showed that new phase of Ferro Nitride (Fe 4 N) has been formed with 4.17% nitrogen weight equivalent to 14.73% nitrogen atom and with the thickness of 5.71 μm, 5.08% nitrogen weight or 17.51% nitrogen atom and 6.78 μm thickness, and 5.69% nitrogen weight or 19.24% nitrogen atom and 8.57 μm thickness. (author)

Inductively coupled plasma as atomization, excitation and ionization sources in analytical atomic spectrometry

International Nuclear Information System (INIS)

Kawaguchi, Hiroshi

1996-01-01

Studies on inductively coupled plasma (ICP) for atomic emission and mass spectrometry accomplished in our laboratory since 1978 are reviewed. In emission spectrometry, the characteristics of the plasma are studied concerning the spatial profiles of spectral line intensity, axial profiles of gas and excitation temperatures, spectral line widths and matrix effect. The studies are particularly emphasized on the instrumentation such as developments of plasma generator, emission spectrometers, water-cooled torches and sample introduction methods. A slew-scan type spectrometer developed in these works represents a predecessor of the current commercial spectrometers. An ICP mass spectrometer was first developed in Japan in this laboratory in 1984. Non-spectroscopic interference of this method was found to have the correlation with the atomic weight of the matrix element. Plasma gases other than argon such as nitrogen and oxygen were used for the ICP to evaluate their performance in mass spectrometry as for the sensitivity and interferences. (author). 63 refs

Level population measurements on analyte atom and ion excited states in the inductively coupled plasma

International Nuclear Information System (INIS)

Walker, Z.H.; Blades, M.W.

1986-01-01

During the past decade a number of publications dealing with fundamental studies of the inductively coupled plasma (ICP) have appeared in the literature. The purpose of many of these investigations has been to understand the nature of the interaction between the plasma gas and the analyte. The general conclusion drawn from these studies has been that the ICP is very close to Local Thermodynamic Equilibrium (LTE), but that some deviations from LTE do occur. Recent studies by the authors' have been directed towards the measurement of analyte atom and ion excited state level populations with the objective of obtaining a better understanding of both ionization and excitation in the ICP discharge and the extent to which such processes contribute to a non-equilibrium state. Further discussion is drawn from similar measurements made on elements with low ionization potentials, such as Barium, as well as on elements such as Iron in the presence of Easily Ionizable Elements (EIE's). The spatial and power dependences of such measurements are also discussed

The inductively coupled plasma as a source for the measurement of fundamental spectroscopic constants

International Nuclear Information System (INIS)

Farnsworth, P.B.

1993-01-01

Inductively coupled plasmas (ICPs) are stable, robust sources for the generation of spectra from neutral and singly ionized atoms. They are used extensively for analytical spectrometry, but have seen limited use for the measurement of fundamental spectroscopic constants. Several properties of the ICP affect its suitability for such fundamental measurements. They include: spatial structure, spectral background, noise characteristics, electron densities and temperatures, and the state of equilibrium in the plasma. These properties are particularly sensitive to the means by which foreign atoms are introduced into the plasma. With some departures from the operating procedures normally used in analytical measurements, the ICP promise to be a useful source for the measurement of fundamental atomic constants. (orig.)

Plasma and process characterization of high power magnetron physical vapor deposition with integrated plasma equipment--feature profile model

International Nuclear Information System (INIS)

Zhang Da; Stout, Phillip J.; Ventzek, Peter L.G.

2003-01-01

High power magnetron physical vapor deposition (HPM-PVD) has recently emerged for metal deposition into deep submicron features in state of the art integrated circuit fabrication. However, the plasma characteristics and process mechanism are not well known. An integrated plasma equipment-feature profile modeling infrastructure has therefore been developed for HPM-PVD deposition, and it has been applied to simulating copper seed deposition with an Ar background gas for damascene metalization. The equipment scale model is based on the hybrid plasma equipment model [M. Grapperhaus et al., J. Appl. Phys. 83, 35 (1998); J. Lu and M. J. Kushner, ibid., 89, 878 (2001)], which couples a three-dimensional Monte Carlo sputtering module within a two-dimensional fluid model. The plasma kinetics of thermalized, athermal, and ionized metals and the contributions of these species in feature deposition are resolved. A Monte Carlo technique is used to derive the angular distribution of athermal metals. Simulations show that in typical HPM-PVD processing, Ar + is the dominant ionized species driving sputtering. Athermal metal neutrals are the dominant deposition precursors due to the operation at high target power and low pressure. The angular distribution of athermals is off axis and more focused than thermal neutrals. The athermal characteristics favor sufficient and uniform deposition on the sidewall of the feature, which is the critical area in small feature filling. In addition, athermals lead to a thick bottom coverage. An appreciable fraction (∼10%) of the metals incident to the wafer are ionized. The ionized metals also contribute to bottom deposition in the absence of sputtering. We have studied the impact of process and equipment parameters on HPM-PVD. Simulations show that target power impacts both plasma ionization and target sputtering. The Ar + ion density increases nearly linearly with target power, different from the behavior of typical ionized PVD processing. The

Fluorophore-based sensor for oxygen radicals in processing plasmas

International Nuclear Information System (INIS)

Choudhury, Faraz A.; Shohet, J. Leon; Sabat, Grzegorz; Sussman, Michael R.; Nishi, Yoshio

2015-01-01

A high concentration of radicals is present in many processing plasmas, which affects the processing conditions and the properties of materials exposed to the plasma. Determining the types and concentrations of free radicals present in the plasma is critical in order to determine their effects on the materials being processed. Current methods for detecting free radicals in a plasma require multiple expensive and bulky instruments, complex setups, and often, modifications to the plasma reactor. This work presents a simple technique that detects reactive-oxygen radicals incident on a surface from a plasma. The measurements are made using a fluorophore dye that is commonly used in biological and cellular systems for assay labeling in liquids. Using fluorometric analysis, it was found that the fluorophore reacts with oxygen radicals incident from the plasma, which is indicated by degradation of its fluorescence. As plasma power was increased, the quenching of the fluorescence significantly increased. Both immobilized and nonimmobilized fluorophore dyes were used and the results indicate that both states function effectively under vacuum conditions. The reaction mechanism is very similar to that of the liquid dye

Fluorophore-based sensor for oxygen radicals in processing plasmas

Energy Technology Data Exchange (ETDEWEB)

Choudhury, Faraz A.; Shohet, J. Leon, E-mail: shohet@engr.wisc.edu [Plasma Processing and Technology Laboratory and Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States); Sabat, Grzegorz; Sussman, Michael R. [Department of Biochemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States); Nishi, Yoshio [Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States)

2015-11-15

A high concentration of radicals is present in many processing plasmas, which affects the processing conditions and the properties of materials exposed to the plasma. Determining the types and concentrations of free radicals present in the plasma is critical in order to determine their effects on the materials being processed. Current methods for detecting free radicals in a plasma require multiple expensive and bulky instruments, complex setups, and often, modifications to the plasma reactor. This work presents a simple technique that detects reactive-oxygen radicals incident on a surface from a plasma. The measurements are made using a fluorophore dye that is commonly used in biological and cellular systems for assay labeling in liquids. Using fluorometric analysis, it was found that the fluorophore reacts with oxygen radicals incident from the plasma, which is indicated by degradation of its fluorescence. As plasma power was increased, the quenching of the fluorescence significantly increased. Both immobilized and nonimmobilized fluorophore dyes were used and the results indicate that both states function effectively under vacuum conditions. The reaction mechanism is very similar to that of the liquid dye.

Methods for detecting and correcting inaccurate results in inductively coupled plasma-atomic emission spectrometry

Science.gov (United States)

Chan, George C. Y. [Bloomington, IN; Hieftje, Gary M [Bloomington, IN

2010-08-03

A method for detecting and correcting inaccurate results in inductively coupled plasma-atomic emission spectrometry (ICP-AES). ICP-AES analysis is performed across a plurality of selected locations in the plasma on an unknown sample, collecting the light intensity at one or more selected wavelengths of one or more sought-for analytes, creating a first dataset. The first dataset is then calibrated with a calibration dataset creating a calibrated first dataset curve. If the calibrated first dataset curve has a variability along the location within the plasma for a selected wavelength, errors are present. Plasma-related errors are then corrected by diluting the unknown sample and performing the same ICP-AES analysis on the diluted unknown sample creating a calibrated second dataset curve (accounting for the dilution) for the one or more sought-for analytes. The cross-over point of the calibrated dataset curves yields the corrected value (free from plasma related errors) for each sought-for analyte.

Determination of trimethyllead reference material using high performance liquid chromatography-inductively coupled plasma mass spectrometry

International Nuclear Information System (INIS)

Lu Hai; Wei Chao; Wang Jun; Chao Jingbo; Zhou Tao; Chen Dazhou

2005-01-01

A high-performance liquid chromatography-inductively coupled plasma mass spectrometry (HPLC-ICPMS) was combined, and the chromatography conditions were optimized. The stability and homogeneity of a trimethyllead reference material were determined using this method. (authors)

Investigations of the role of nonlinear couplings in structure formation and transport regulation in plasma turbulence

Science.gov (United States)

Holland, Christopher George

Studies of nonlinear couplings and dynamics in plasma turbulence are presented. Particular areas of focus are analytic studies of coherent structure formation in electron temperature gradient turbulence, measurement of nonlinear energy transfer in simulations of plasma turbulence, and bispectral analysis of experimental and computational data. The motivation for these works has been to develop and expand the existing theories of plasma transport, and verify the nonlinear predictions of those theories in simulation and experiment. In Chapter II, we study electromagnetic secondary instabilities of electron temperature gradient turbulence. The growth rate for zonal flow generation via modulational instability of electromagnetic ETG turbulence is calculated, as well as that for zonal (magnetic) field generation. In Chapter III, the stability and saturation of streamers in ETG turbulence is considered, and shown to depend sensitively upon geometry and the damping rates of the Kelvin-Helmholtz mode. Requirements for a credible theory of streamer transport are presented. In addition, a self-consistent model for interactions between ETG and ITG (ion temperature gradient) turbulence is presented. In Chapter IV, the nonlinear transfer of kinetic and internal energy is measured in simulations of plasma turbulence. The regulation of turbulence by radial decorrelation due to zonal flows and generation of zonal flows via the Reynolds stress are explicitly demonstrated, and shown to be symmetric facets of a single nonlinear process. Novel nonlinear saturation mechanisms for zonal flows are discussed. In Chapter V, measurements of fluctuation bicoherence in the edge of the DIII-D tokamak are presented. It is shown that the bicoherence increases transiently before a L-H transition, and decays to its initial value after the barrier has formed. The increase in bicoherence is localized to the region where the transport barrier forms, and shows strong coupling between well

Plasma breakdown in a capacitively-coupled radiofrequency argon discharge

Science.gov (United States)

Smith, H. B.; Charles, C.; Boswell, R. W.

1998-10-01

Low pressure, capacitively-coupled rf discharges are widely used in research and commercial ventures. Understanding of the non-equilibrium processes which occur in these discharges during breakdown is of interest, both for industrial applications and for a deeper understanding of fundamental plasma behaviour. The voltage required to breakdown the discharge V_brk has long been known to be a strong function of the product of the neutral gas pressure and the electrode seperation (pd). This paper investigates the dependence of V_brk on pd in rf systems using experimental, computational and analytic techniques. Experimental measurements of V_brk are made for pressures in the range 1 -- 500 mTorr and electrode separations of 2 -- 20 cm. A Paschen-style curve for breakdown in rf systems is developed which has the minimum breakdown voltage at a much smaller pd value, and breakdown voltages which are significantly lower overall, than for Paschen curves obtained from dc discharges. The differences between the two systems are explained using a simple analytic model. A Particle-in-Cell simulation is used to investigate a similar pd range and examine the effect of the secondary emission coefficient on the rf breakdown curve, particularly at low pd values. Analytic curves are fitted to both experimental and simulation results.

Bead Injection Extraction Chromatography using High-capacity Lab-on-Valve as a Front End to Inductively Coupled Plasma Mass Spectrometry for Rapid Urine Radiobioassay

DEFF Research Database (Denmark)

Qiao, Jixin; Hou, Xiaolin; Roos, Per

2013-01-01

A novel bead injection (BI) extraction chromatographic microflow system exploiting high-capacity lab-on-valve (LOV) platform coupled with inductively coupled plasma mass spectrometric detection is developed for rapid and automated determination of plutonium in human urine. A microconduit (1 m......L) incorporated within the LOV processing unit is loaded on-line with a metered amount of disposable extraction chromatographic resin (up to 330 mg of TEVA) through programmable beads transport. Selective capture and purification of plutonium onto the resin beads is then performed by pressure driven flow after...

Process-independent strong running coupling

International Nuclear Information System (INIS)

Binosi, Daniele; Mezrag, Cedric; Papavassiliou, Joannis; Roberts, Craig D.; Rodriguez-Quintero, Jose

2017-01-01

Here, we unify two widely different approaches to understanding the infrared behavior of quantum chromodynamics (QCD), one essentially phenomenological, based on data, and the other computational, realized via quantum field equations in the continuum theory. Using the latter, we explain and calculate a process-independent running-coupling for QCD, a new type of effective charge that is an analogue of the Gell-Mann–Low effective coupling in quantum electrodynamics. The result is almost identical to the process-dependent effective charge defined via the Bjorken sum rule, which provides one of the most basic constraints on our knowledge of nucleon spin structure. As a result, this reveals the Bjorken sum to be a near direct means by which to gain empirical insight into QCD's Gell-Mann–Low effective charge.

Novel high-frequency energy-efficient pulsed-dc generator for capacitively coupled plasma discharge

Science.gov (United States)

Mamun, Md Abdullah Al; Furuta, Hiroshi; Hatta, Akimitsu

2018-03-01

The circuit design, assembly, and operating tests of a high-frequency and high-voltage (HV) pulsed dc generator (PDG) for capacitively coupled plasma (CCP) discharge inside a vacuum chamber are reported. For capacitive loads, it is challenging to obtain sharp rectangular pulses with fast rising and falling edges, requiring intense current for quick charging and discharging. The requirement of intense current generally limits the pulse operation frequency. In this study, we present a new type of PDG consisting of a pair of half-resonant converters and a constant current-controller circuit connected with HV solid-state power switches that can deliver almost rectangular high voltage pulses with fast rising and falling edges for CCP discharge. A prototype of the PDG is assembled to modulate from a high-voltage direct current (HVdc) input into a pulsed HVdc output, while following an input pulse signal and a set current level. The pulse rise time and fall time are less than 500 ns and 800 ns, respectively, and the minimum pulse width is 1 µs. The maximum voltage for a negative pulse is 1000 V, and the maximum repetition frequency is 500 kHz. During the pulse on time, the plasma discharge current is controlled steadily at the set value. The half-resonant converters in the PDG perform recovery of the remaining energy from the capacitive load at every termination of pulse discharge. The PDG performed with a high energy efficiency of 85% from the HVdc input to the pulsed dc output at a repetition rate of 1 kHz and with stable plasma operation in various discharge conditions. The results suggest that the developed PDG can be considered to be more efficient for plasma processing by CCP.

Novel high-frequency energy-efficient pulsed-dc generator for capacitively coupled plasma discharge.

Science.gov (United States)

Mamun, Md Abdullah Al; Furuta, Hiroshi; Hatta, Akimitsu

2018-03-01

The circuit design, assembly, and operating tests of a high-frequency and high-voltage (HV) pulsed dc generator (PDG) for capacitively coupled plasma (CCP) discharge inside a vacuum chamber are reported. For capacitive loads, it is challenging to obtain sharp rectangular pulses with fast rising and falling edges, requiring intense current for quick charging and discharging. The requirement of intense current generally limits the pulse operation frequency. In this study, we present a new type of PDG consisting of a pair of half-resonant converters and a constant current-controller circuit connected with HV solid-state power switches that can deliver almost rectangular high voltage pulses with fast rising and falling edges for CCP discharge. A prototype of the PDG is assembled to modulate from a high-voltage direct current (HVdc) input into a pulsed HVdc output, while following an input pulse signal and a set current level. The pulse rise time and fall time are less than 500 ns and 800 ns, respectively, and the minimum pulse width is 1 µs. The maximum voltage for a negative pulse is 1000 V, and the maximum repetition frequency is 500 kHz. During the pulse on time, the plasma discharge current is controlled steadily at the set value. The half-resonant converters in the PDG perform recovery of the remaining energy from the capacitive load at every termination of pulse discharge. The PDG performed with a high energy efficiency of 85% from the HVdc input to the pulsed dc output at a repetition rate of 1 kHz and with stable plasma operation in various discharge conditions. The results suggest that the developed PDG can be considered to be more efficient for plasma processing by CCP.

Analysis of zirconium alloys using inductively-coupled plasma emission spectrometry

International Nuclear Information System (INIS)

White, G.F.; Pickford, C.J.

1982-06-01

As part of an interlaboratory collaborative exercise, certain trace and minor elements have been determined in a proposed zircaloy reference material using inductively-coupled plasma emission spectrometry. A dissolution procedure involving hydrochloric and hydrofluoric acids was used for determination of Hf, Cr, Fe and Sn. Data have also been obtained for Ni, Cu and Mn. Use of a high resolution monochromator in a scanning mode was found necessary for measurement of the emission intensities in order to resolve the spectral lines of interest from the intense and complex emission from the zirconium matrix. (author)

Coupled processes and the tropical climatology : part III : instabilities of the fully coupled climatology

NARCIS (Netherlands)

Dijkstra, H.A.; Neelin, J.D.

1998-01-01

Coupled processes between the equatorial ocean and atmosphere control the spatial structure of the annual mean state in the Pacific region,in particular the warm-pool/cold- tongue structure.At the same time,coupled processes are known to be responsible for the variability about this mean state,in

Stochastic substitute for coupled rate equations in the modeling of highly ionized transient plasmas

International Nuclear Information System (INIS)

Eliezer, S.; Falquina, R.; Minguez, E.

1994-01-01

Plasmas produced by intense laser pulses incident on solid targets often do not satisfy the conditions for local thermodynamic equilibrium, and so cannot be modeled by transport equations relying on equations of state. A proper description involves an excessively large number of coupled rate equations connecting many quantum states of numerous species having different degrees of ionization. Here we pursue a recent suggestion to model the plasma by a few dominant states perturbed by a stochastic driving force. The driving force is taken to be a Poisson impulse process, giving a Langevin equation which is equivalent to a Fokker-Planck equation for the probability density governing the distribution of electron density. An approximate solution to the Langevin equation permits calculation of the characteristic relaxation rate. An exact stationary solution to the Fokker-Planck equation is given as a function of the strength of the stochastic driving force. This stationary solution is used, along with a Laplace transform, to convert the Fokker-Planck equation to one of Schroedinger type. We consider using the classical Hamiltonian formalism and the WKB method to obtain the time-dependent solution

Effect of actuating voltage and discharge gap on plasma assisted detonation initiation process

Science.gov (United States)

Siyin, ZHOU; Xueke, CHE; Wansheng, NIE; Di, WANG

2018-06-01

The influence of actuating voltage and discharge gap on plasma assisted detonation initiation by alternating current dielectric barrier discharge was studied in detail. A loose coupling method was used to simulate the detonation initiation process of a hydrogen–oxygen mixture in a detonation tube under different actuating voltage amplitudes and discharge gap sizes. Both the discharge products and the detonation forming process assisted by the plasma were analyzed. It was found that the patterns of the temporal and spatial distributions of discharge products in one cycle keep unchanged as changing the two discharge operating parameters. However, the adoption of a higher actuating voltage leads to a higher active species concentration within the discharge zone, and atom H is the most sensitive to the variations of the actuating voltage amplitude among the given species. Adopting a larger discharge gap results in a lower concentration of the active species, and all species have the same sensitivity to the variations of the gap. With respect to the reaction flow of the detonation tube, the corresponding deflagration to detonation transition (DDT) time and distance become slightly longer when a higher actuating voltage is chosen. The acceleration effect of plasma is more prominent with a smaller discharge gap, and the benefit builds gradually throughout the DDT process. Generally, these two control parameters have little effect on the amplitude of the flow field parameters, and they do not alter the combustion degree within the reaction zone.

Plasma hearth process demonstration project

International Nuclear Information System (INIS)

Geimer, R.M.; Gillins, R.L.

1995-01-01

The Plasma Hearth Process (PHP) demonstration project is one of the key technology projects in the US Department of Energy (DOE) Office of Technology Development Mixed Waste Focus Area. The PHP is a high temperature thermal treatment process using a plasma arc torch in a stationary, refractory lined chamber that destroys organics and stabilizes the residuals in a nonleaching, vitrified waste form, greatly improving the disposability of the waste. This paper describes the PHP system and summarizes test results to date, including volume reduction, destruction and removal efficiencies for organic wastes, and emission characteristics. Tests performed so far demonstrate that the PHP adresses DOE mixed waste final waste form requirements and US Environmental Protection Agency Toxicity Characteristic Leaching Procedure requirements

Magnetohydrodynamic stability of tokamak plasmas with poloidal mode coupling

International Nuclear Information System (INIS)

Shigueoka, H.; Sakanaka, P.H.

1987-01-01

The stability behavior with respect to internal modes is examined for a class of tokamak equilibria with non-circular cross sections. The surfaces of the constant poloidal magnetic flux ψ (R,Z) are obtained numerically by solving the Grad-Shafranov's equation with a specified shape for the outmost plasma surface. The equation of motion for ideal MHD stability is written in a ortogonal coordinate system (ψ, χ, φ). Th e stability analysis is performance numerically in a truncated set of coupled m (poloidal wave number) equations. The calculations involve no approximations, and so all parameters of the equilibrium solution can be arbitrarily varied. (author) [pt

Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles

International Nuclear Information System (INIS)

Tawidian, H; Mikikian, M.; Couedel, L.; Lecas, T.

2011-01-01

Dusty plasmas can be found in fusion devices. In this paper we analyse a new phenomenon occurring during dust particle growth instabilities and consisting of the appearance of small plasma spheroids in the vicinity of discharge electrodes. Small plasma spheroids are evidenced and analyzed in front of the electrodes of a capacitively-coupled radio-frequency discharge in which dust particles are growing. These regions are characterized by a spherical shape, a slightly enhanced luminosity and are related to instabilities induced by the presence of dust particles. Several types of behaviors are identified and particularly their chaotic appearance or disappearance and their rotational motion along the electrode periphery. Correlations with the unstable behavior of the global plasma glow are performed. These analyses are obtained thanks to high-speed imaging which is the only diagnostics able to evidence these plasma spheroids

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

Energy Technology Data Exchange (ETDEWEB)

Marneffe, J.-F. de, E-mail: marneffe@imec.be; Lukaszewicz, M.; Porter, S. B.; Vajda, F.; Rutigliani, V.; Verdonck, P.; Baklanov, M. R. [IMEC v.z.w., 3001 Leuven (Belgium); Zhang, L.; Heyne, M.; El Otell, Z.; Krishtab, M. [IMEC v.z.w., 3001 Leuven (Belgium); Department of Chemistry, KULeuven, 3001 Leuven (Belgium); Goodyear, A.; Cooke, M. [Oxford Instruments Plasma Technology, BS49 4AP Bristol (United Kingdom)

2015-10-07

Porous organosilicate glass thin films, with k-value 2.0, were exposed to 147 nm vacuum ultra-violet (VUV) photons emitted in a Xenon capacitive coupled plasma discharge. Strong methyl bond depletion was observed, concomitant with a significant increase of the bulk dielectric constant. This indicates that, besides reactive radical diffusion, photons emitted during plasma processing do impede dielectric properties and therefore need to be tackled appropriately during patterning and integration. The detrimental effect of VUV irradiation can be partly suppressed by stuffing the low-k porous matrix with proper sacrificial polymers showing high VUV absorption together with good thermal and VUV stability. In addition, the choice of an appropriate hard-mask, showing high VUV absorption, can minimize VUV damage. Particular processing conditions allow to minimize the fluence of photons to the substrate and lead to negligible VUV damage. For patterned structures, in order to reduce VUV damage in the bulk and on feature sidewalls, the combination of both pore stuffing/material densification and absorbing hard-mask is recommended, and/or the use of low VUV-emitting plasma discharge.

Detection, in real time, of metallic pollutants present in the industrial atmospheric effluents by inductively coupled plasma torch; Detection, en temps reel, d'elements metalliques presents dans les rejets atmospheriques industriels par torche a plasma a couplage inductif

Energy Technology Data Exchange (ETDEWEB)

Vacher, D.

2001-12-15

This work is devoted to the development of a process of detection in real time of metallic pollutants present in industrial atmospheric effluents. The method of measurement is the atomic spectrometry of emission coupled to an ICP torch (Inductively coupled Plasma). The technology of the fluidized beds is used as system of introduction of the metallic particles into the ICP torch, the interest of the principle of detection resting on the stamping from the usual procedure of calibration of the analytical system. The results are presented in two parts. The first relates to the diagnosis of plasmas formed with various mixtures of N{sub 2}/O{sub 2} which one corresponds to pure air, the second presents the setting process of detection in real time starting from the intensities ratios of the spectral lines of the metallic element with those of the plasma-producing element (argon or pure air) The study of the diagnosis of plasmas made up of mixtures N{sub 2}/O{sub 2} relates to the determination of the atomic excitation temperature from the spectral lines of the copper element and the evaluation of the thermal disequilibrium q Te/Th. This last is obtained by considering the mass enthalpy of various mixtures N{sub 2}/O{sub 2}. The existence of a small thermal disequilibrium is highlighted. The study of detection in real time by ICP torch, without calibration of the system, is based on three points: - spectroscopic data processing to determine the values of the intensities ratios of spectral lines; - the insertion of the intensities ratios and the characteristics of plasma (argon or pure air) into a calculation code of plasma composition; - the comparison of the mass flux values of the metallic pollutants, in real time, obtained by experiments with those resulting from the elutriation calculation, term which defines the phenomenon of entrainment of the particles out of the fluidized bed. The results made it possible to show the similarity of the analytical system response

Inductively coupled plasma-atomic emission spectroscopy glovebox assembly system at the West Valley Demonstration Project

International Nuclear Information System (INIS)

Marlow, J.H.; McCarthy, K.M.; Tamul, N.R.

1999-01-01

The inductively coupled plasma/atomic emission spectroscopy [ICP/AES (ICP)] system for elemental analyses in support of vitrification processing was first installed in 1986. The initial instrument was a Jobin Yvon (JY) Model JY-70 ICP that consisted of sequential and simultaneous spectrometers for analysis of nonradioactive samples as radioactive surrogates. The JY-70 ICP continued supporting nonradioactive testing during the Functional and Checkout Testing of Systems (FACTS) using the full-scale melter with ''cold'' (nonradioactive) testing campaigns. As a result, the need for another system was identified to allow for the analysis of radioactive samples. The Mass Spec (Spectrometry) Lab was established for the installation of the modified ICP system for handling radioactive samples. The conceptual setup of another ICP was predicated on the use of a hood to allow ease of accessibility of the torch, nebulizer, and spray chamber, and the minimization of air flow paths. However, reconsideration of the radioactive sample dose rate and contamination levels led to the configuration of the glovebox system with a common transfer interface box for the ICP and the inductively coupled plasma-mass spectrometer (ICP-MS) glovebox assemblies. As a result, a simultaneous Model JY-50P ICP with glovebox was installed in 1990 as a first generation ICP glovebox system. This was one of the first ICP glovebox assemblies connected with an ICP-MS glovebox system. Since the economics of processing high-level radioactive waste (HLW) required the availability of an instrument to operate 24 hours a day throughout the year without any downtime, a second generation ICP glovebox assembly was designed, manufactured, and installed in 1995 using a Model JY-46P ICP. These two ICP glovebox systems continue to support vitrification of the HLW into canisters for storage. The ICP systems have been instrumental in monitoring vitrification batch processing. To date, remote sample preparation and

Inductively coupled plasma-mass spectrometry: an initial assessment of the VG isotopes Plasmaquad

International Nuclear Information System (INIS)

Brown, R.M.; Pickford, C.J.

1985-04-01

The Chemical Analysis Group has been approached by a British Scientific instrument maker regarding the possibility of the group participating in a Department of Trade and Industry sponsored scheme whereby we would have a 12 month period to assess the advantages and disadvantages of a new analytical technique, Inductively Coupled Plasma-Mass Spectrometry. This report details our initial assessment of the instrument, carried out in order to decide whether to participate in the scheme. We have attempted to discover whether the instrument meets the claims made of it in advertising literature, and have attempted to compare the technique with another, proven technique, Inductively Coupled Plasma - Optical Emission Spectroscopy. The Plasmaquad offers excellent sensitivity for almost all of the elements of the periodic table, giving a distinct improvement over the Chemical Analysis Group's present capabilities for many elements. The isotope ratio measuring ability is important, as the Group has no such capability at the moment and a demand for this type of measurement is foreseen. Our conclusions, while inevitably somewhat subjective, form the basis for recommending Harwell to participate in the scheme. (author)

Amplification through chaotic synchronization in spatially extended beam-plasma systems

Science.gov (United States)

Moskalenko, Olga I.; Frolov, Nikita S.; Koronovskii, Alexey A.; Hramov, Alexander E.

2017-12-01

In this paper, we have studied the relationship between chaotic synchronization and microwave signal amplification in coupled beam-plasma systems. We have considered a 1D particle-in-cell numerical model of unidirectionally coupled beam-plasma oscillatory media being in the regime of electron pattern formation. We have shown the significant gain of microwave oscillation power in coupled beam-plasma media being in the different regimes of generation. The discovered effect has a close connection with the chaotic synchronization phenomenon, so we have observed that amplification appears after the onset of the complete time scale synchronization regime in the analyzed coupled spatially extended systems. We have also provided the numerical study of physical processes in the chain of beam-plasma systems leading to the chaotic synchronization and the amplification of microwave oscillations power, respectively.

Equilibration and hydrodynamics at strong and weak coupling

NARCIS (Netherlands)

Schee, Wilke van der

2017-01-01

We give an updated overview of both weak and strong coupling methods to describe the approach to a plasma described by viscous hydrodynamics, a process now called hydrodynamisation. At weak coupling the very first moments after a heavy ion collision is described by the colour-glass condensate

Applications of inductively coupled plasma-mass spectrometry to radionuclide determinations: Second volume

International Nuclear Information System (INIS)

Morrow, R.W.; Crain, J.S.

1998-01-01

Even from its early conception, inductively coupled plasma-mass spectrometry (ICP-MS) was thought to be well-suited to the unique measurement problems facing the nuclear industry. These thoughts were well-founded; indeed, one might consider it unusual if a modern nuclear research center did not have access to one or more ICP mass spectrometers (quadrupole or otherwise). However, as ICP-MS has matured, improvements in sensitivity and precision have made possible measurements that were inconceivable to the founding fathers of the technology. Therefore, there is a periodic need to gather information and obtain a snapshot in time of the technology and its applications in nuclear energy. This second symposium was an international event in which speakers from the US, Europe, and the Middle East described new developments in ICP-MS relevant to the nuclear energy community. The papers presented at the 1998 symposium are published herein. Several papers have been processed separately for inclusion on the data base

Gaseous material capacity of open plasma jet in plasma spray-physical vapor deposition process

Science.gov (United States)

Liu, Mei-Jun; Zhang, Meng; Zhang, Qiang; Yang, Guan-Jun; Li, Cheng-Xin; Li, Chang-Jiu

2018-01-01

Plasma spray-physical vapor deposition (PS-PVD) process, emerging as a highly efficient hybrid approach, is based on two powerful technologies of both plasma spray and physical vapor deposition. The maximum production rate is affected by the material feed rate apparently, but it is determined by the material vapor capacity of transporting plasma actually and essentially. In order to realize high production rate, the gaseous material capacity of plasma jet must be fundamentally understood. In this study, the thermal characteristics of plasma were measured by optical emission spectrometry. The results show that the open plasma jet is in the local thermal equilibrium due to a typical electron number density from 2.1 × 1015 to 3.1 × 1015 cm-3. In this condition, the temperature of gaseous zirconia can be equal to the plasma temperature. A model was developed to obtain the vapor pressure of gaseous ZrO2 molecules as a two dimensional map of jet axis and radial position corresponding to different average plasma temperatures. The overall gaseous material capacity of open plasma jet, take zirconia for example, was further established. This approach on evaluating material capacity in plasma jet would shed light on the process optimization towards both depositing columnar coating and a high production rate of PS-PVD.

About the EDF formation in a capacitively coupled argon plasma

International Nuclear Information System (INIS)

Tatanova, M; Thieme, G; Basner, R; Hannemann, M; Golubovskii, Yu B; Kersten, H

2006-01-01

The formation of the electron distribution function (EDF) in the bulk plasma of a capacitively coupled radio-frequency (rf) discharge in argon generated in the plasma-chemical reactor PULVA-INP is investigated experimentally and theoretically. Measurements of the EDF and internal plasma parameters were performed by means of a Langmuir probe at pressures of 0.5-100 Pa and discharge powers of 5-100 W. The observed EDFs have revealed a two-temperature behaviour at low pressures and evolved into a Maxwellian distribution at high gas pressures and large discharge powers. Theoretical determination of the EDF is based on the numerical solution of the Boltzmann kinetic equation in the local and non-local approaches under experimental conditions. The model includes elastic and inelastic electron-atom collisions and electron-electron interactions. Low electron temperatures and relatively high ionization degrees are the features of the PULVA-INP rf discharge. This leads to significant influence of the electron-electron collisions on the EDF formation. The modelled and measured distributions show good agreement in a wide range of discharge parameters, except for a range of low gas pressures, where the stochastic electron heating is intense. Additionally, mechanisms of the EDF formation in the dc and rf discharge were compared under similar discharge conditions

About the EDF formation in a capacitively coupled argon plasma

Energy Technology Data Exchange (ETDEWEB)

Tatanova, M [Institute of Physics, Saint-Petersburg State University, ul. Ulianovskaja 1, 198504 Saint-Petersburg (Russian Federation); Thieme, G [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Basner, R [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Hannemann, M [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany); Golubovskii, Yu B [Institute of Physics, Saint-Petersburg State University, ul. Ulianovskaja 1, 198504 Saint-Petersburg (Russian Federation); Kersten, H [Institut fur Niedertemperatur-Plasmaphysik, Friedrich-Ludwig-Jahn-Str 19, D-17489 Greifswald (Germany)

2006-08-01

The formation of the electron distribution function (EDF) in the bulk plasma of a capacitively coupled radio-frequency (rf) discharge in argon generated in the plasma-chemical reactor PULVA-INP is investigated experimentally and theoretically. Measurements of the EDF and internal plasma parameters were performed by means of a Langmuir probe at pressures of 0.5-100 Pa and discharge powers of 5-100 W. The observed EDFs have revealed a two-temperature behaviour at low pressures and evolved into a Maxwellian distribution at high gas pressures and large discharge powers. Theoretical determination of the EDF is based on the numerical solution of the Boltzmann kinetic equation in the local and non-local approaches under experimental conditions. The model includes elastic and inelastic electron-atom collisions and electron-electron interactions. Low electron temperatures and relatively high ionization degrees are the features of the PULVA-INP rf discharge. This leads to significant influence of the electron-electron collisions on the EDF formation. The modelled and measured distributions show good agreement in a wide range of discharge parameters, except for a range of low gas pressures, where the stochastic electron heating is intense. Additionally, mechanisms of the EDF formation in the dc and rf discharge were compared under similar discharge conditions.

Dense high-temperature plasma transport processes

International Nuclear Information System (INIS)

Giniyatova, Sh.G.

2002-01-01

In this work the transport processes in dense high-temperature semiclassical plasma are studied on the base of the kinetic equation, where the semiclassical potential was used, in its collision integral. The coefficient of plasma electrical conductivity, viscosity and thermal conductivity were received. There were compared with the other authors' results. The Grad's method was used obtaining of viscosity and thermal coefficients. (author)

Bifurcation analysis for ion acoustic waves in a strongly coupled plasma including trapped electrons

Science.gov (United States)

El-Labany, S. K.; El-Taibany, W. F.; Atteya, A.

2018-02-01

The nonlinear ion acoustic wave propagation in a strongly coupled plasma composed of ions and trapped electrons has been investigated. The reductive perturbation method is employed to derive a modified Korteweg-de Vries-Burgers (mKdV-Burgers) equation. To solve this equation in case of dissipative system, the tangent hyperbolic method is used, and a shock wave solution is obtained. Numerical investigations show that, the ion acoustic waves are significantly modified by the effect of polarization force, the trapped electrons and the viscosity coefficients. Applying the bifurcation theory to the dynamical system of the derived mKdV-Burgers equation, the phase portraits of the traveling wave solutions of both of dissipative and non-dissipative systems are analyzed. The present results could be helpful for a better understanding of the waves nonlinear propagation in a strongly coupled plasma, which can be produced by photoionizing laser-cooled and trapped electrons [1], and also in neutron stars or white dwarfs interior.

Direct rare earth determination by inductively coupled plasma optical emission spectrometry

International Nuclear Information System (INIS)

Marin, Sergio; Cornejo, Silvia; Rojas, Jacqueline

2003-01-01

In the present work, the use of the inductively coupled plasma optical emission spectrometry (ICP-OES), for the sequential determination of Rare Earth elements in the metallurgical process samples is described. In the first place, the optimum parameters for the determination of the elements in study are established, like instrumental calibration, wavelengths spectral selection and interference of matrix. Next, the methodology for the digestion of solid samples (system of digestion with pressure) and the recovery of the interest elements are presented. Two material rocks as of reference Syenite SY3 are used. In order to assure the validity of the obtained data, the reference materials SY2 and SY3 were analyzed by means of two different techniques, ICP-OES and ICP-Mass, this last one was made by an international laboratory and a fusion with lithium metaborate was used with digestion method. Finally, the obtained results demonstrate that the reproducibility in the recovery of rare earth analyzed by both techniques is comparable, and that the methodology of digestion used for these elements is statistically valid (author)

An evaluation of inductively coupled plasma optical emission spectrometry using electrothermal atomisation sample introduction and photographic plate detection

International Nuclear Information System (INIS)

Khathing, D.T.; Pickford, C.J.

1984-05-01

A photographic radiation measurement approach has been used with an inductively coupled plasma source to evaluate and tabulate the more prominent optical emission lines of 66 elements. Compared with the more common sample introduction technique using nebulisation, increased sensitivity for multielement analysis of small samples was achieved by using a simple graphite electrothermal atomisation system. This was constructed to serve as a dual purpose atomiser ie both for Atomic Absorption and for Inductively Coupled Plasma Emission spectroscopy. The system offers the advantage of a wide multi-elemental coverage, but sensitivities achieved with photographic detection are poorer than those obtained photoelectrically. (author)

Inductively coupled plasma induced deep levels in epitaxial n-GaAs